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Sample records for amorphous semiconductors doped

  1. Amorphous semiconductor solar cell

    DOEpatents

    Dalal, Vikram L.

    1981-01-01

    A solar cell comprising a back electrical contact, amorphous silicon semiconductor base and junction layers and a top electrical contact includes in its manufacture the step of heat treating the physical junction between the base layer and junction layer to diffuse the dopant species at the physical junction into the base layer.

  2. Permanent optical doping of amorphous metal oxide semiconductors by deep ultraviolet irradiation at room temperature

    SciTech Connect

    Seo, Hyungtak; Cho, Young-Je; Bobade, Santosh M.; Park, Kyoung-Youn; Choi, Duck-Kyun; Kim, Jinwoo; Lee, Jaegab

    2010-05-31

    We report an investigation of two photon ultraviolet (UV) irradiation induced permanent n-type doping of amorphous InGaZnO (a-IGZO) at room temperature. The photoinduced excess electrons were donated to change the Fermi-level to a conduction band edge under the UV irradiation, owing to the hole scavenging process at the oxide interface. The use of optically n-doped a-IGZO channel increased the carrier density to approx10{sup 18} cm{sup -3} from the background level of 10{sup 16} cm{sup -3}, as well as the comprehensive enhancement upon UV irradiation of a-IGZO thin film transistor parameters, such as an on-off current ratio at approx10{sup 8} and field-effect mobility at 22.7 cm{sup 2}/V s.

  3. Method for sputtering a PIN microcrystalline/amorphous silicon semiconductor device with the P and N-layers sputtered from boron and phosphorous heavily doped targets

    DOEpatents

    Moustakas, Theodore D.; Maruska, H. Paul

    1985-04-02

    A silicon PIN microcrystalline/amorphous silicon semiconductor device is constructed by the sputtering of N, and P layers of silicon from silicon doped targets and the I layer from an undoped target, and at least one semi-transparent ohmic electrode.

  4. Doping semiconductor nanocrystals.

    PubMed

    Erwin, Steven C; Zu, Lijun; Haftel, Michael I; Efros, Alexander L; Kennedy, Thomas A; Norris, David J

    2005-07-01

    Doping--the intentional introduction of impurities into a material--is fundamental to controlling the properties of bulk semiconductors. This has stimulated similar efforts to dope semiconductor nanocrystals. Despite some successes, many of these efforts have failed, for reasons that remain unclear. For example, Mn can be incorporated into nanocrystals of CdS and ZnSe (refs 7-9), but not into CdSe (ref. 12)--despite comparable bulk solubilities of near 50 per cent. These difficulties, which have hindered development of new nanocrystalline materials, are often attributed to 'self-purification', an allegedly intrinsic mechanism whereby impurities are expelled. Here we show instead that the underlying mechanism that controls doping is the initial adsorption of impurities on the nanocrystal surface during growth. We find that adsorption--and therefore doping efficiency--is determined by three main factors: surface morphology, nanocrystal shape, and surfactants in the growth solution. Calculated Mn adsorption energies and equilibrium shapes for several nanocrystals lead to specific doping predictions. These are confirmed by measuring how the Mn concentration in ZnSe varies with nanocrystal size and shape. Finally, we use our predictions to incorporate Mn into previously undopable CdSe nanocrystals. This success establishes that earlier difficulties with doping are not intrinsic, and suggests that a variety of doped nanocrystals--for applications from solar cells to spintronics--can be anticipated. PMID:16001066

  5. Doped semiconductors and other solar energy materials

    NASA Astrophysics Data System (ADS)

    Williamson, D. L.

    1988-02-01

    A review is presented of recent applications of Mössbauer spectroscopy that focus on determining the fate of doped impurities in semiconductors, primarily GaAs, Ga1-xAlxAs and Si. Other solar energy materials and processes which are discussed include amorphous Si∶H-based alloys, chalcopyrites, transparent conducting oxides, photochemical processing via semiconductor powders in electrolytes, mirror making, and plant photosynthesis.

  6. Superconductivity in doped semiconductors

    NASA Astrophysics Data System (ADS)

    Bustarret, E.

    2015-07-01

    A historical survey of the main normal and superconducting state properties of several semiconductors doped into superconductivity is proposed. This class of materials includes selenides, tellurides, oxides and column-IV semiconductors. Most of the experimental data point to a weak coupling pairing mechanism, probably phonon-mediated in the case of diamond, but probably not in the case of strontium titanate, these being the most intensively studied materials over the last decade. Despite promising theoretical predictions based on a conventional mechanism, the occurrence of critical temperatures significantly higher than 10 K has not been yet verified. However, the class provides an enticing playground for testing theories and devices alike.

  7. Doped semiconductor nanocrystal junctions

    NASA Astrophysics Data System (ADS)

    Borowik, Ł.; Nguyen-Tran, T.; Roca i Cabarrocas, P.; Mélin, T.

    2013-11-01

    Semiconductor junctions are the basis of electronic and photovoltaic devices. Here, we investigate junctions formed from highly doped (ND≈1020-1021cm-3) silicon nanocrystals (NCs) in the 2-50 nm size range, using Kelvin probe force microscopy experiments with single charge sensitivity. We show that the charge transfer from doped NCs towards a two-dimensional layer experimentally follows a simple phenomenological law, corresponding to formation of an interface dipole linearly increasing with the NC diameter. This feature leads to analytically predictable junction properties down to quantum size regimes: NC depletion width independent of the NC size and varying as ND-1/3, and depleted charge linearly increasing with the NC diameter and varying as ND1/3. We thus establish a "nanocrystal counterpart" of conventional semiconductor planar junctions, here however valid in regimes of strong electrostatic and quantum confinements.

  8. Narrow band gap amorphous silicon semiconductors

    DOEpatents

    Madan, A.; Mahan, A.H.

    1985-01-10

    Disclosed is a narrow band gap amorphous silicon semiconductor comprising an alloy of amorphous silicon and a band gap narrowing element selected from the group consisting of Sn, Ge, and Pb, with an electron donor dopant selected from the group consisting of P, As, Sb, Bi and N. The process for producing the narrow band gap amorphous silicon semiconductor comprises the steps of forming an alloy comprising amorphous silicon and at least one of the aforesaid band gap narrowing elements in amount sufficient to narrow the band gap of the silicon semiconductor alloy below that of amorphous silicon, and also utilizing sufficient amounts of the aforesaid electron donor dopant to maintain the amorphous silicon alloy as an n-type semiconductor.

  9. Method of doping a semiconductor

    DOEpatents

    Yang, Chiang Y.; Rapp, Robert A.

    1983-01-01

    A method for doping semiconductor material. An interface is established between a solid electrolyte and a semiconductor to be doped. The electrolyte is chosen to be an ionic conductor of the selected impurity and the semiconductor material and electrolyte are jointly chosen so that any compound formed from the impurity and the semiconductor will have a free energy no lower than the electrolyte. A potential is then established across the interface so as to allow the impurity ions to diffuse into the semiconductor. In one embodiment the semiconductor and electrolyte may be heated so as to increase the diffusion coefficient.

  10. Doped semiconductor nanocrystal junctions

    SciTech Connect

    Borowik, Ł.; Mélin, T.; Nguyen-Tran, T.; Roca i Cabarrocas, P.

    2013-11-28

    Semiconductor junctions are the basis of electronic and photovoltaic devices. Here, we investigate junctions formed from highly doped (N{sub D}≈10{sup 20}−10{sup 21}cm{sup −3}) silicon nanocrystals (NCs) in the 2–50 nm size range, using Kelvin probe force microscopy experiments with single charge sensitivity. We show that the charge transfer from doped NCs towards a two-dimensional layer experimentally follows a simple phenomenological law, corresponding to formation of an interface dipole linearly increasing with the NC diameter. This feature leads to analytically predictable junction properties down to quantum size regimes: NC depletion width independent of the NC size and varying as N{sub D}{sup −1/3}, and depleted charge linearly increasing with the NC diameter and varying as N{sub D}{sup 1/3}. We thus establish a “nanocrystal counterpart” of conventional semiconductor planar junctions, here however valid in regimes of strong electrostatic and quantum confinements.

  11. Amorphous Semiconductor Thin Films, an Introduction

    SciTech Connect

    Martin, Peter M.

    2003-12-01

    The field of amorphous semiconductors is so large that I cannot do it justice, but I hope this short column gives you some insight into the properties and materials available, and the issues involved.

  12. Semiconductor device PN junction fabrication using optical processing of amorphous semiconductor material

    SciTech Connect

    Sopori, Bhushan; Rangappan, Anikara

    2014-11-25

    Systems and methods for semiconductor device PN junction fabrication are provided. In one embodiment, a method for fabricating an electrical device having a P-N junction comprises: depositing a layer of amorphous semiconductor material onto a crystalline semiconductor base, wherein the crystalline semiconductor base comprises a crystalline phase of a same semiconductor as the amorphous layer; and growing the layer of amorphous semiconductor material into a layer of crystalline semiconductor material that is epitaxially matched to the lattice structure of the crystalline semiconductor base by applying an optical energy that penetrates at least the amorphous semiconductor material.

  13. (Magnetic properties of doped semiconductors)

    SciTech Connect

    Not Available

    1990-01-01

    Research continued on the transport behavior of doped semiconductors on both sides of the metal-insulator transition, and the approach to the transition from both the insulating and the metallic side. Work is described on magneto resistance of a series of metallic Si:B samples and CdSe. (CBS)

  14. Electrons and phonons in amorphous semiconductors

    NASA Astrophysics Data System (ADS)

    Prasai, Kiran; Biswas, Parthapratim; Drabold, D. A.

    2016-07-01

    The coupling between lattice vibrations and electrons is one of the central concepts of condensed matter physics. The subject has been deeply studied for crystalline materials, but far less so for amorphous and glassy materials, which are among the most important for applications. In this paper, we explore the electron-lattice coupling using current tools of a first-principles computer simulation. We choose three materials to illustrate the phenomena: amorphous silicon (a-Si), amorphous selenium (a-Se) and amorphous gallium nitride (a-GaN). In each case, we show that there is a strong correlation between the localization of electron states and the magnitude of thermally induced fluctuations in energy eigenvalues obtained from the density-functional theory (i.e. Kohn–Sham eigenvalues). We provide a heuristic theory to explain these observations. The case of a-GaN, a topologically disordered partly ionic insulator, is distinctive compared to the covalent amorphous examples. Next, we explore the consequences of changing the charge state of a system as a proxy for tracking photo-induced structural changes in the materials. Where transport is concerned, we lend insight into the Meyer–Neldel compensation rule and discuss a thermally averaged Kubo–Greenwood formula as a means to estimate electrical conductivity and especially its temperature dependence. We close by showing how the optical gap of an amorphous semiconductor can be computationally engineered with the judicious use of Hellmann–Feynman forces (associated with a few defect states) using molecular dynamics simulations. These forces can be used to close or open an optical gap, and identify a structure with a prescribed gap. We use the approach with plane-wave density functional methods to identify a low-energy amorphous phase of silicon including several coordination defects, yet with a gap close to that of good quality a-Si models.

  15. Boron doping a semiconductor particle

    DOEpatents

    Stevens, Gary Don; Reynolds, Jeffrey Scott; Brown, Louanne Kay

    1998-06-09

    A method (10,30) of boron doping a semiconductor particle using boric acid to obtain a p-type doped particle. Either silicon spheres or silicon powder is mixed with a diluted solution of boric acid having a predetermined concentration. The spheres are dried (16), with the boron film then being driven (18) into the sphere. A melt procedure mixes the driven boron uniformly throughout the sphere. In the case of silicon powder, the powder is metered out (38) into piles and melted/fused (40) with an optical furnace. Both processes obtain a p-type doped silicon sphere with desired resistivity. Boric acid is not a restricted chemical, is inexpensive, and does not pose any special shipping, handling, or disposal requirements.

  16. Boron doping a semiconductor particle

    SciTech Connect

    Stevens, G.D.; Reynolds, J.S.; Brown, L.K.

    1998-06-09

    A method of boron doping a semiconductor particle using boric acid to obtain a p-type doped particle. Either silicon spheres or silicon powder is mixed with a diluted solution of boric acid having a predetermined concentration. The spheres are dried, with the boron film then being driven into the sphere. A melt procedure mixes the driven boron uniformly throughout the sphere. In the case of silicon powder, the powder is metered out into piles and melted/fused with an optical furnace. Both processes obtain a p-type doped silicon sphere with desired resistivity. Boric acid is not a restricted chemical, is inexpensive, and does not pose any special shipping, handling, or disposal requirements. 2 figs.

  17. Improved method of preparing p-i-n junctions in amorphous silicon semiconductors

    DOEpatents

    Madan, A.

    1984-12-10

    A method of preparing p/sup +/-i-n/sup +/ junctions for amorphous silicon semiconductors includes depositing amorphous silicon on a thin layer of trivalent material, such as aluminum, indium, or gallium at a temperature in the range of 200/sup 0/C to 250/sup 0/C. At this temperature, the layer of trivalent material diffuses into the amorphous silicon to form a graded p/sup +/-i junction. A layer of n-type doped material is then deposited onto the intrinsic amorphous silicon layer in a conventional manner to finish forming the p/sup +/-i-n/sup +/ junction.

  18. Phosphorus doping a semiconductor particle

    DOEpatents

    Stevens, G.D.; Reynolds, J.S.

    1999-07-20

    A method of phosphorus doping a semiconductor particle using ammonium phosphate is disclosed. A p-doped silicon sphere is mixed with a diluted solution of ammonium phosphate having a predetermined concentration. These spheres are dried with the phosphorus then being diffused into the sphere to create either a shallow or deep p-n junction. A good PSG glass layer is formed on the surface of the sphere during the diffusion process. A subsequent segregation anneal process is utilized to strip metal impurities from near the p-n junction into the glass layer. A subsequent HF strip procedure is then utilized to removed the PSG layer. Ammonium phosphate is not a restricted chemical, is inexpensive, and does not pose any special shipping, handling, or disposal requirement. 1 fig.

  19. Phosphorous doping a semiconductor particle

    DOEpatents

    Stevens, Gary Don; Reynolds, Jeffrey Scott

    1999-07-20

    A method (10) of phosphorus doping a semiconductor particle using ammonium phosphate. A p-doped silicon sphere is mixed with a diluted solution of ammonium phosphate having a predetermined concentration. These spheres are dried (16, 18), with the phosphorus then being diffused (20) into the sphere to create either a shallow or deep p-n junction. A good PSG glass layer is formed on the surface of the sphere during the diffusion process. A subsequent segregation anneal process is utilized to strip metal impurities from near the p-n junction into the glass layer. A subsequent HF strip procedure is then utilized to removed the PSG layer. Ammonium phosphate is not a restricted chemical, is inexpensive, and does not pose any special shipping, handling, or disposal requirement.

  20. Lucky drift impact ionization in amorphous semiconductors

    NASA Astrophysics Data System (ADS)

    Kasap, Safa; Rowlands, J. A.; Baranovskii, S. D.; Tanioka, Kenkichi

    2004-08-01

    The review of avalanche multiplication experiments clearly confirms the existence of the impact ionization effect in this class of semiconductors. The semilogarithmic plot of the impact ionization coefficient (α) versus the reciprocal field (1/F) for holes in a-Se and electrons in a-Se and a-Si :H places the avalanche multiplication phenomena in amorphous semiconductors at much higher fields than those typically reported for crystalline semiconductors with comparable bandgaps. Furthermore, in contrast to well established concepts for crystalline semiconductors, the impact ionization coefficient in a-Se increases with increasing temperature. The McKenzie and Burt [S. McKenzie and M. G. Burt, J. Phys. C 19, 1959 (1986)] version of Ridley's lucky drift (LD) model [B. K. Ridley, J. Phys. C 16, 3373 (1988)] has been applied to impact ionization coefficient versus field data for holes and electrons in a-Se and electrons in a-Si :H. We have extracted the electron impact ionization coefficient versus field (αe vs F) data for a-Si :H from the multiplication versus F and photocurrent versus F data recently reported by M. Akiyama, M. Hanada, H. Takao, K. Sawada, and M. Ishida, Jpn. J. Appl. Phys.41, 2552 (2002). Provided that one accepts the basic assumption of the Ridley LD model that the momentum relaxation rate is faster than the energy relaxation rate, the model can satisfactorily account for impact ionization in amorphous semiconductors even with ionizing excitation across the bandgap, EI=Eg. If λ is the mean free path associated with momentum relaxing collisions and λE is the energy relaxation length associated with energy relaxing collisions, than the LD model requires λE>λ. The application of the LD model with energy and field independent λE to a-Se leads to ionization threshold energies EI that are quite small, less than Eg/2, and requires the possible but improbable ionization of localized states. By making λE=λE(E ,F) energy and field dependent, we were

  1. Charge injection in doped organic semiconductors

    NASA Astrophysics Data System (ADS)

    Hosseini, A. R.; Wong, Man Hoi; Shen, Yulong; Malliaras, George G.

    2005-01-01

    The influence of doping on the process of charge injection from a metal electrode into a model organic semiconductor is investigated. The contact resistance, which is the relevant figure-of-merit, is found to decrease dramatically upon doping beyond what is expected from theory and seen in crystalline semiconductors. This phenomenon is understood in terms of broadening of the transport manifold in the organic semiconductor, induced by the dopants.

  2. Method for measuring the drift mobility in doped semiconductors

    DOEpatents

    Crandall, Richard S.

    1982-01-01

    A method for measuring the drift mobility of majority carriers in semiconductors consists of measuring the current transient in a Schottky-barrier device following the termination of a forward bias pulse. An example is given using an amorphous silicon hydrogenated material doped with 0.2% phosphorous. The method is particularly useful with material in which the dielectric relaxation time is shorter than the carrier transit time. It is particularly useful in material useful in solar cells.

  3. Method for measuring the drift mobility in doped semiconductors

    DOEpatents

    Crandall, R.S.

    1982-03-09

    A method for measuring the drift mobility of majority carriers in semiconductors consists of measuring the current transient in a Schottky-barrier device following the termination of a forward bias pulse. An example is given using an amorphous silicon hydrogenated material doped with 0.2% phosphorus. The method is particularly useful with material in which the dielectric relaxation time is shorter than the carrier transit time. It is particularly useful in material useful in solar cells. 10 figs.

  4. Significant improvement in electronic properties of transparent amorphous indium zinc oxide through yttrium doping

    NASA Astrophysics Data System (ADS)

    Sun, Jian; Yu, Zhigen; Huang, Yanhua; Xia, Yijie; Lai, Weng Soon; Gong, Hao

    2014-04-01

    One big challenge in transparent conducting oxides (TCOs) is to achieve high conductivity and mobility at a low processing temperature. Although optimized conductivity has been achieved in indium zinc oxide (IZO) without doping, it is still interesting to find whether doping can improve conductivity of IZO further. In this paper, we report a low processing temperature achievement of high conductivity and mobility of IZO through yttrium (Y) doping. We found that with different Y doping levels, room temperature fabricated amorphous IZO (a-IZO) samples can be controlled to exhibit either metallic or semiconductor characteristics. Y2O3 is demonstrated to be an effective doping source to achieve conductivity 300% higher than the non-doped IZO sample. Anomalously improved mobility of certain Y2O3-doped IZO samples compared with the non-doped IZO sample is found and analyzed. Besides, a low-temperature resistivity anomaly (semiconductor metal transition) phenomenon is observed and discussed.

  5. Charge carrier generation in photosensitive amorphous molecular semiconductors

    NASA Astrophysics Data System (ADS)

    Barabash, Y.; Kharkyanen, V.; Zabolotny, M.; Zabolotnaya, T.

    2006-05-01

    Thermalization process in photosensitive amorphous molecular semiconductors are theoretically considered from standpoint of their parameters, namely: thermalization time, thermalization length. The heat electron formed in consequence of absorption of the light quantum by semiconductor molecules loses his surplus energy in the time of inelastic interaction with neighbouring atoms. The results of theoretical predictions are confirmed by the experimental ones obtained for a number of molecular semiconductors (anthracene, pentacene, PVC, PEPC).

  6. Room-temperature fabrication of light-emitting thin films based on amorphous oxide semiconductor

    NASA Astrophysics Data System (ADS)

    Kim, Junghwan; Miyokawa, Norihiko; Ide, Keisuke; Toda, Yoshitake; Hiramatsu, Hidenori; Hosono, Hideo; Kamiya, Toshio

    2016-01-01

    We propose a light-emitting thin film using an amorphous oxide semiconductor (AOS) because AOS has low defect density even fabricated at room temperature. Eu-doped amorphous In-Ga-Zn-O thin films fabricated at room temperature emitted intense red emission at 614 nm. It is achieved by precise control of oxygen pressure so as to suppress oxygen-deficiency/excess-related defects and free carriers. An electronic structure model is proposed, suggesting that non-radiative process is enhanced mainly by defects near the excited states. AOS would be a promising host for a thin film phosphor applicable to flexible displays as well as to light-emitting transistors.

  7. Electron beam recrystallization of amorphous semiconductor materials

    NASA Technical Reports Server (NTRS)

    Evans, J. C., Jr.

    1968-01-01

    Nucleation and growth of crystalline films of silicon, germanium, and cadmium sulfide on substrates of plastic and glass were investigated. Amorphous films of germanium, silicon, and cadmium sulfide on amorphous substrates of glass and plastic were converted to the crystalline condition by electron bombardment.

  8. Superlattice doped layers for amorphous silicon photovoltaic cells

    DOEpatents

    Arya, Rajeewa R.

    1988-01-12

    Superlattice doped layers for amorphous silicon photovoltaic cells comprise a plurality of first and second lattices of amorphous silicon alternatingly formed on one another. Each of the first lattices has a first optical bandgap and each of the second lattices has a second optical bandgap different from the first optical bandgap. A method of fabricating the superlattice doped layers also is disclosed.

  9. Method of depositing wide bandgap amorphous semiconductor materials

    DOEpatents

    Ellis, Jr., Frank B.; Delahoy, Alan E.

    1987-09-29

    A method of depositing wide bandgap p type amorphous semiconductor materials on a substrate without photosensitization by the decomposition of one or more higher order gaseous silanes in the presence of a p-type catalytic dopant at a temperature of about 200.degree. C. and a pressure in the range from about 1-50 Torr.

  10. Characterization of Amorphous Zinc Tin Oxide Semiconductors

    SciTech Connect

    Rajachidambaram, Jaana Saranya; Sanghavi, Shail P.; Nachimuthu, Ponnusamy; Shutthanandan, V.; Varga, Tamas; Flynn, Brendan T.; Thevuthasan, Suntharampillai; Herman, Gregory S.

    2012-06-12

    Amorphous zinc tin oxide (ZTO) was investigated to determine the effect of deposition and post annealing conditions on film structure, composition, surface contamination, and thin film transistor (TFT) device performance. X-ray diffraction results indicated that the ZTO films remain amorphous even after annealing to 600 °C. We found that the bulk Zn:Sn ratio of the sputter deposited films were slightly tin rich compared to the composition of the ceramic sputter target, and there was a significant depletion of zinc at the surface. X-ray photoelectron spectroscopy also indicated that residual surface contamination depended strongly on the sample post-annealing conditions where water, carbonate and hydroxyl species were absorbed to the surface. Electrical characterization of ZTO films, using TFT test structures, indicated that mobilities as high as 17 cm2/Vs could be obtained for depletion mode devices.

  11. Method of doping organic semiconductors

    DOEpatents

    Kloc, Christian Leo; Ramirez, Arthur Penn; So, Woo-Young

    2012-02-28

    A method includes the steps of forming a contiguous semiconducting region and heating the region. The semiconducting region includes polyaromatic molecules. The heating raises the semiconducting region to a temperature above room temperature. The heating is performed in the presence of a dopant gas and the absence of light to form a doped organic semiconducting region.

  12. Phase transitions and doping in semiconductor nanocrystals

    NASA Astrophysics Data System (ADS)

    Sahu, Ayaskanta

    Colloidal semiconductor nanocrystals are a promising technological material because their size-dependent optical and electronic properties can be exploited for a diverse range of applications such as light-emitting diodes, bio-labels, transistors, and solar cells. For many of these applications, electrical current needs to be transported through the devices. However, while their solution processability makes these colloidal nanocrystals attractive candidates for device applications, the bulky surfactants that render these nanocrystals dispersible in common solvents block electrical current. Thus, in order to realize the full potential of colloidal semiconductor nanocrystals in the next-generation of solid-state devices, methods must be devised to make conductive films from these nanocrystals. One way to achieve this would be to add minute amounts of foreign impurity atoms (dopants) to increase their conductivity. Electronic doping in nanocrystals is still very much in its infancy with limited understanding of the underlying mechanisms that govern the doping process. This thesis introduces an innovative synthesis of doped nanocrystals and aims at expanding the fundamental understanding of charge transport in these doped nanocrystal films. The list of semiconductor nanocrystals that can be doped is large, and if one combines that with available dopants, an even larger set of materials with interesting properties and applications can be generated. In addition to doping, another promising route to increase conductivity in nanocrystal films is to use nanocrystals with high ionic conductivities. This thesis also examines this possibility by studying new phases of mixed ionic and electronic conductors at the nanoscale. Such a versatile approach may open new pathways for interesting fundamental research, and also lay the foundation for the creation of novel materials with important applications. In addition to their size-dependence, the intentional incorporation of

  13. Optical and thermal properties of doped semiconductor

    NASA Astrophysics Data System (ADS)

    Abroug, S.; Saadallah, F.; Yacoubi, N.

    2008-01-01

    The knowledge of doping effects on optical and thermal properties of semiconductors is crucial for the development of optoelectronic compounds. The purpose of this work is to investigate theses effects by mirage effect technique and spectroscopic ellipsometry SE. The absorption spectra measured for differently doped Si and GaAs bulk samples, show that absorption in the near IR increases with dopant density and also the band gap shifts toward low energies. This behavior is due to free carrier absorption which could be obtained by subtracting phonon assisted absorption from the measured spectrum. This carrier absorption is related to the dopant density throw a semi-empirical model.

  14. Ultrafast processes in semiconductor doped glasses

    NASA Astrophysics Data System (ADS)

    Brito Cruz, Carlos H.; Cesar, Carlos Lenz; Barbosa, Luis Carlos; de Paula, Ana M.; Tsuda, Sérgio

    1997-02-01

    We review studies of resonant and nonresonant ultrafast optical processes in semiconductor doped glasses, made at the University of Campinas. First we discuss measurements done in CdTe quantum-dots in glass, excited resonantly. In this case we observe a fast recombination, that depends on the size of the quantum-dot. For the smallest dots, with 3.2 nm average radius, the recovery time constant was found to be 360 fs. Then we describe the observation of the Optical Stark shift in CdSxSe1-x semiconductor-doped glass (SDG) excited under nonresonant below gap condition and probed with femtosecond optical pulses. An ultrafast and pure light-induced shift of the band edge is observed. For a pump intensity of 3 GW/cm2 the band shifts by 11 meV. The response of the shift tracks the profile of the pumping pulse.

  15. Stability of amorphous metal films on semiconductor substrates

    NASA Astrophysics Data System (ADS)

    Perepezko, J. H.; Wiley, J. D.

    In the culmination of work which began in June 1984, goals of this research have been as follows: Investigation of the stability of amorphous alloy films during diffusion and interdiffusion treatments. The atomic transport measurements will be conducted by a combination of RBS and AES techniques as explained in earlier reports. X-ray diffraction and transmission electron microscopy will be used for structural examination. Investigation of the electrical behavior of amorphous metal/semiconductor contacts, including both the interfacial electrical (Schottky barrier and Ohmic) behavior and the stability of the amorphous metallization against current-induced degradation by electromigration. Fundamental studies of the electromigration process itself will be conducted in this broader context. Examination of structural relaxation during post-depression annealing will also take place.

  16. Amorphous metallizations for high-temperature semiconductor device applications

    NASA Technical Reports Server (NTRS)

    Wiley, J. D.; Perepezko, J. H.; Nordman, J. E.; Kang-Jin, G.

    1981-01-01

    The initial results of work on a class of semiconductor metallizations which appear to hold promise as primary metallizations and diffusion barriers for high temperature device applications are presented. These metallizations consist of sputter-deposited films of high T sub g amorphous-metal alloys which (primarily because of the absence of grain boundaries) exhibit exceptionally good corrosion-resistance and low diffusion coefficients. Amorphous films of the alloys Ni-Nb, Ni-Mo, W-Si, and Mo-Si were deposited on Si, GaAs, GaP, and various insulating substrates. The films adhere extremely well to the substrates and remain amorphous during thermal cycling to at least 500 C. Rutherford backscattering and Auger electron spectroscopy measurements indicate atomic diffussivities in the 10 to the -19th power sq cm/S range at 450 C.

  17. Chemical vapor deposition of amorphous semiconductor films. Final subcontract report

    SciTech Connect

    Rocheleau, R.E.

    1984-12-01

    Chemical vapor deposition (CVD) from higher order silanes has been studied for fabricating amorphous hydrogenated silicon thin-film solar cells. Intrinsic and doped a-Si:H films were deposited in a reduced-pressure, tubular-flow reactor, using disilane feed-gas. Conditions for depositing intrinsic films at growth rates up to 10 A/s were identified. Electrical and optical properties, including dark conductivity, photoconductivity, activation energy, optical absorption, band-gap and sub-band-gap absorption properties of CVD intrinsic material were characterized. Parameter space for depositing intrinsic and doped films, suitable for device analysis, was identified.

  18. Doped semiconductor nanoparticles synthesized in gas-phase plasmas

    NASA Astrophysics Data System (ADS)

    Pereira, R. N.; Almeida, A. J.

    2015-08-01

    Crystalline nanoparticles (NPs) of semiconductor materials have been attracting huge research interest due to their potential use in future applications like photovoltaics and bioimaging. The important role that intentional impurity doping plays in semiconductor technology has ignited a great deal of research effort aiming at synthesizing semiconductor NPs doped with foreign impurities and at understanding their physical and chemical properties. In this respect, plasma-grown semiconductor NPs doped in situ during synthesis have been key in studies of doped NPs. This article presents a review of the advances in understanding the properties of doped semiconductor NPs synthesized by means of plasma methods and the role played by these NPs for our current understanding of doped NPs and the general behavior of doping in nanoscale materials.

  19. Magnetoresistance Phenomena in a Variety of Amorphous Semiconductors and Insulators

    NASA Astrophysics Data System (ADS)

    Mutch, Michael; Westley, David; Lenahan, Patrick; Semiconductor Spectroscopy Lab at Penn State University Team

    We report on near zero-field magnetoresistance (MR) phenomena in a variety of amorphous semiconductors and insulators. We utilize electrically detected magnetic resonance (EDMR) measurements at multiple fields and frequencies to complement MR measurements. EDMR, the electrically detected analog of electron paramagnetic resonance (EPR), provides both information about the chemical nature and energy levels of point defects involved. Semiconductors in this study include a-BC:H, a-C:H, diamond-like carbon (DLC), and a-Si:H. Insulators include a-SiN:H, a-SiOC:H, a-SiCN:H. In hydrogenated amorphous systems, near featureless EPR and EDMR spectra are often difficult to analyze. We utilize multiple field and frequency EDMR results including ultra-low field/frequency (ν = 85 MHz, B = 3 mT) EDMR measurements to provide insight into defect chemistry in these systems. We have also made EDMR and MR conditions over a wide range of metal/semiconductor heterojunction and metal/insulator/semiconductor biasing conditions. By comparing variable bias measurements with band diagrams, we gain an elementary understanding of defect energy levels. We believe our results will be of significant importance for understanding defect mediated spin-dependent transport in these systems. The authors would like to thanks Dr. Sean King of Intel Corporation for the provision of samples.

  20. Novel silane and disilane precursors to amorphous semiconductors: Final subcontract report, May 1988

    SciTech Connect

    Pernisz, U.C.; Sharp, K.G.

    1988-09-01

    This Final Report describes the preparation and characterization of amorphous fluorohydrogenated silicon thin films. The novel approach in this study lies in the use of fluorinated silanes as film precursors. The advantages of this method are well defined initial ratios of hydrogen and fluorine to silicon and greatly reduced hazards in the handling of the gas. Fluorine derivatives of both silane and disilane were synthesized. Both glow discharge (or plasma-enhanced CVD) and thermal (CVD) methods were employed to prepare amorphous silicon on glass and silicon wafers. The electrical characterization of the material prepared from difluorosilane showed that the a-Si:H:F films obtained are of solar-grade semiconductor quality and can be doped to p- and n-type materials with diborane and phosphine. 29 refs., 24 figs., 10 tabs.

  1. Density driven structural transformations in amorphous semiconductor clathrates

    SciTech Connect

    Tulk, Christopher A.; dos Santos, Antonio M.; Neuefeind, Joerg C.; Molaison, Jamie J.; Sales, Brian C.; Honkimaeki, Veijo

    2015-01-16

    The pressure induced crystalline collapse at 14.7 GPa and polyamorphic structures of the semiconductor clathrate Sr8Ga16Ge30 are reported up to 35 GPa. In-situ total scattering measurements under pressure allow the direct microscopic inspection of the mechanisms associated with pressure induced amorphization in these systems, as well as the structure of the recovered phase. It is observed that, between 14.7 and 35 GPa the second peak in the structure factor function gradually disappears. Analysis of the radial distribution function extracted from those data indicate that this feature is associated with gradual cage collapse and breakdown of the tetrahedral structure with the consequent systematic lengthening of the nearest-neighbor framework bonds. This suggests an overall local coordination change to an even higher density amorphous form. Upon recovery from high pressure, the sample remains amorphous, and while there is some indication of the guest-host cage reforming, it doesn't seem that the tetrahedral coordination is recovered. As such, the compresion-decompression process in this systems gives rise to three distict amorphous forms.

  2. Density driven structural transformations in amorphous semiconductor clathrates

    DOE PAGESBeta

    Tulk, Christopher A.; dos Santos, Antonio M.; Neuefeind, Joerg C.; Molaison, Jamie J.; Sales, Brian C.; Honkimaeki, Veijo

    2015-01-16

    The pressure induced crystalline collapse at 14.7 GPa and polyamorphic structures of the semiconductor clathrate Sr8Ga16Ge30 are reported up to 35 GPa. In-situ total scattering measurements under pressure allow the direct microscopic inspection of the mechanisms associated with pressure induced amorphization in these systems, as well as the structure of the recovered phase. It is observed that, between 14.7 and 35 GPa the second peak in the structure factor function gradually disappears. Analysis of the radial distribution function extracted from those data indicate that this feature is associated with gradual cage collapse and breakdown of the tetrahedral structure with themore » consequent systematic lengthening of the nearest-neighbor framework bonds. This suggests an overall local coordination change to an even higher density amorphous form. Upon recovery from high pressure, the sample remains amorphous, and while there is some indication of the guest-host cage reforming, it doesn't seem that the tetrahedral coordination is recovered. As such, the compresion-decompression process in this systems gives rise to three distict amorphous forms.« less

  3. Theoretical studies of electronic band-tail states, Anderson transition and surfaces of amorphous semiconductors

    NASA Astrophysics Data System (ADS)

    Dong, Jianjun

    In this dissertation, we study the Anderson transition within the electronic band tail states, and amorphous surfaces. The disorder induced band tail states is one of the unique character of amorphous semiconductors. Because of the proximity to the Fermi level, the nature of these band tail states is of obvious interest to theory of doping and transport. The study of amorphous solid surface is also an interesting area for theory. It is possible to have some major rearrangements near surfaces of amorphous solids (the amorphous analog of surface reconstruction), and the local bonding environment could be dramatically different from that of bulk. The study of the surfaces can also help people toward understanding the growth mechanism. First, electronic band tail states of amorphous silicon and amorphous diamond were studied based on the large (4096 atom) and realistic structural models. To solve the large tight-binding Hamiltonian matrices, we used two order N methods: the maximum entropy method for computing the total densities of states, and the modified Lanczos techniques for computing the individual energy eigenstates in the band gap regions. The DC conductivity was estimated with the Kubo formula. Next, the structural and electronic properties of the surfaces of tetrahedral amorphous carbon (ta-C) were also studied with a first-principles, local basis LDA technique. We reported two structural models made under different conditions, and examined the transition of the local bonding environment from the bulk to the surface. In the study of band tail states, we observe that Anderson (local-to-extended) transition within the band states proceeds by "cluster proliferation". We interpret the nature of band tail states in terms of a "resonant cluster model" through which one can qualitatively understand the evolution of the states from midgap toward the mobility edges. In the study of ta-C surfaces, we observe that nearly 50% surface atoms are threefold coordinated and

  4. Anomalous hopping conduction in nanocrystalline/amorphous composites and amorphous semiconductor thin films

    NASA Astrophysics Data System (ADS)

    Kakalios, James; Bodurtha, Kent

    Composite nanostructured materials consisting of nanocrystals (nc) embedded within a thin film amorphous matrix can exhibit novel opto-electronic properties. Composite films are synthesized in a dual-chamber co-deposition PECVD system capable of producing nanocrystals of material A and embedding then within a thin film matrix of material B. Electronic conduction in composite thin films of hydrogenated amorphous silicon (a-Si:H) containing nc-germanium or nc-silicon inclusions, as well as in undoped a-Si:H, does not follow an Arrhenius temperature dependence, but rather is better described by an anomalous hopping expression (exp[-(To/T)3/4) , as determined from the ``reduced activation energy'' proposed by Zabrodskii and Shlimak. This temperature dependence has been observed in other thin film resistive materials, such as ultra-thin disordered films of Ag, Bi, Pb and Pd; carbon-black polymer composites; and weakly coupled Au and ZnO quantum dot arrays. There is presently no accepted theoretical understanding of this expression. The concept of a mobility edge, accepted for over four decades, appears to not be necessary to account for charge transport in amorphous semiconductors. Supported by NSF-DMR and the Minnesota Nano Center.

  5. Bi-Se doped with Cu, p-type semiconductor

    SciTech Connect

    Bhattacharya, Raghu Nath; Phok, Sovannary; Parilla, Philip Anthony

    2013-08-20

    A Bi--Se doped with Cu, p-type semiconductor, preferably used as an absorber material in a photovoltaic device. Preferably the semiconductor has at least 20 molar percent Cu. In a preferred embodiment, the semiconductor comprises at least 28 molar percent of Cu. In one embodiment, the semiconductor comprises a molar percentage of Cu and Bi whereby the molar percentage of Cu divided by the molar percentage of Bi is greater than 1.2. In a preferred embodiment, the semiconductor is manufactured as a thin film having a thickness less than 600 nm.

  6. Plasma Deposition of Doped Amorphous Silicon

    NASA Technical Reports Server (NTRS)

    Calcote, H. F.

    1985-01-01

    Pair of reports present further experimental details of investigation of plasma deposition of films of phosphorous-doped amosphous silicon. Probe measurements of electrical resistance of deposited films indicated films not uniform. In general, it appeared that resistance decreased with film thickness.

  7. Synthesis and characterization of P-doped amorphous and nanocrystalline Si

    SciTech Connect

    Wang, Jialing; Ganguly, Shreyashi; Sen, Sabyasachi; Browning, Nigel D.; Kauzlarich, Susan M.

    2013-07-01

    Intentional impurity doping lies at the heart of the silicon technology. The dopants provide electrons or holes as necessary carriers of the electron current and can significantly modify the electric, optical and magnetic properties of the semiconductors. P-doped amorphous Si (a-Si) was prepared by a solid state and solution metathesis reaction of a P-doped Zintl phase precursor, NaSi0.99P0.01, with an excess of NH4X (X = Br, I). After the salt byproduct was removed from the solid state reaction, the a-Si material was annealed at 600 °C under vacuum for 2 h, resulting in P-doped nanocrystalline Si (nc-Si) material embedded in a-Si matrix. The product from the solution reaction also shows a combination of nc-Si embedded in a-Si; however, it was fully converted to nc-Si after annealing under argon at 650 °C for 30 min. Powder X-ray diffraction (XRD) and high resolution transmission electron microscopy (HRTEM) show the amorphous nature of the P-doped Si material before the annealing and the nanocrystallinity after the annealing. Fourier Transform Infrared (FTIR) spectroscopy shows that the P-doped Si material surface is partially capped by H and O or with solvent. Finally, electron microprobe wavelength dispersive spectroscopy (WDS) as well as energy dispersive spectroscopy (EDS) confirm the presence of P in the Si material. 29Si and 31P solid state magic-angle-spinning nuclear magnetic resonance (MAS NMR) spectroscopy data provide the evidence of P doping into the Si structure with the P concentration of approximately 0.07 at.%.

  8. Doping-induced suppression of dislocation formation in semiconductors

    SciTech Connect

    Walukiewicz, W.

    1989-04-15

    A mechanism explaining suppression of dislocation formation in doped semiconductors is proposed. The mechanism is based on the recently introduced concept of amphoteric native defects. It is shown that supersaturation of vacancylike defects depends on the Fermi energy and thus also on the doping level. The calculated dependence of supersaturation on the doping level quantitatively accounts for experimentally observed trends in dislocation suppression in GaAs and InP.

  9. X-ray absorption study of the electronic structure of Mn-doped amorphous Si

    SciTech Connect

    Arenholz, Elke; Zeng, Li; Huegel, A.; Helgren, E.; Hellman, F.; Piamonteze, C.; Arenholz, E.

    2008-03-08

    The electronic structure of Mn in amorphous Si (a-Mn{sub x}Si{sub 1?x}) is studied by X-ray absorption spectroscopy at the Mn L{sub 3,2} edges for x = 0.005-0.18. Except the x = 0.005 sample, which shows a slight signature of Mn{sup 2+} atomic multiplets associated with a local Mn moment, all samples have broad and featureless L{sub 3,2} absorption peaks, corresponding to an itinerant state for all 3d electrons. The broad X-ray absorption spectra exclude the possibility of a localized 3d moment and explain the unexpectedly quenched Mn moment in this magnetically-doped amorphous semiconductor. Such a fully delocalized d state of Mn dopant in Si has not been previously suggested.

  10. Strain-induced photoconductivity in thin films of Co doped amorphous carbon.

    PubMed

    Jiang, Y C; Gao, J

    2014-01-01

    Traditionally, strain effect was mainly considered in the materials with periodic lattice structure, and was thought to be very weak in amorphous semiconductors. Here, we investigate the effects of strain in films of cobalt-doped amorphous carbon (Co-C) grown on 0.7PbMg(1/3)Nb(2/3)O3-0.3PbTiO3 (PMN-PT) substrates. The electric transport properties of the Co-C films were effectively modulated by the piezoelectric substrates. Moreover, we observed, for the first time, strain-induced photoconductivity in such an amorphous semiconductor. Without strain, no photoconductivity was observed. When subjected to strain, the Co-C films exhibited significant photoconductivity under illumination by a 532-nm monochromatic light. A strain-modified photoconductivity theory was developed to elucidate the possible mechanism of this remarkable phenomenon. The good agreement between the theoretical and experimental results indicates that strain-induced photoconductivity may derive from modulation of the band structure via the strain effect. PMID:25338641

  11. Strain-induced photoconductivity in thin films of Co doped amorphous carbon

    PubMed Central

    Jiang, Y. C.; Gao, J.

    2014-01-01

    Traditionally, strain effect was mainly considered in the materials with periodic lattice structure, and was thought to be very weak in amorphous semiconductors. Here, we investigate the effects of strain in films of cobalt-doped amorphous carbon (Co-C) grown on 0.7PbMg1/3Nb2/3O3-0.3PbTiO3 (PMN-PT) substrates. The electric transport properties of the Co-C films were effectively modulated by the piezoelectric substrates. Moreover, we observed, for the first time, strain-induced photoconductivity in such an amorphous semiconductor. Without strain, no photoconductivity was observed. When subjected to strain, the Co-C films exhibited significant photoconductivity under illumination by a 532-nm monochromatic light. A strain-modified photoconductivity theory was developed to elucidate the possible mechanism of this remarkable phenomenon. The good agreement between the theoretical and experimental results indicates that strain-induced photoconductivity may derive from modulation of the band structure via the strain effect. PMID:25338641

  12. Optical evidence for quantization in transparent amorphous oxide semiconductor superlattice

    NASA Astrophysics Data System (ADS)

    Abe, Katsumi; Nomura, Kenji; Kamiya, Toshio; Hosono, Hideo

    2012-08-01

    We fabricated transparent amorphous oxide semiconductor superlattices composed of In-Ga-Zn-O (a-IGZO) well layers and Ga2O3 (a-Ga2O3) barrier layers, and investigated their optical absorption properties to examine energy quantization in the a-IGZO well layer. The Tauc gap of a-IGZO well layers monotonically increases with decreasing well thickness at ≤5 nm. The thickness dependence of the Tauc gap is quantitatively explained by a Krönig-Penny model employing a conduction band offset of 1.2 eV between the a-IGZO and the a-Ga2O3, and the effective masses of 0.35m0 for the a-IGZO well layer and 0.5m0 for the a-Ga2O3 barrier layer, where m0 is the electron rest mass. This result demonstrates the quantization in the a-IGZO well layer. The phase relaxation length of the a-IGZO is estimated to be larger than 3.5 nm.

  13. Sputtered pin amorphous silicon semi-conductor device and method therefor

    DOEpatents

    Moustakas, Theodore D.; Friedman, Robert A.

    1983-11-22

    A high efficiency amorphous silicon PIN semi-conductor device is constructed by the sequential sputtering of N, I and P layers of amorphous silicon and at least one semi-transparent ohmic electrode. A method of construction produces a PIN device, exhibiting enhanced physical integrity and facilitates ease of construction in a singular vacuum system and vacuum pump down procedure.

  14. Nontraditional Amorphous Oxide Semiconductor Thin-Film Transistor Fabrication

    NASA Astrophysics Data System (ADS)

    Sundholm, Eric Steven

    Fabrication techniques and process integration considerations for amorphous oxide semiconductor (AOS) thin-film transistors (TFTs) constitute the central theme of this dissertation. Within this theme three primary areas of focus are pursued. The first focus involves formulating a general framework for assessing passivation. Avoiding formation of an undesirable backside accumulation layer in an AOS bottom-gate TFT is accomplished by (i) choosing a passivation layer in which the charge neutrality level is aligned with (ideal case) or higher in energy than that of the semiconductor channel layer charge neutrality level, and (ii) depositing the passivation layer in such a manner that a negligible density of oxygen vacancies are present at the channel-passivation layer interface. Two AOS TFT passivation schemes are explored. Sputter-deposited zinc tin silicon oxide (ZTSO) appears promising for suppressing the effects of negative bias illumination stress (NBIS) with respect to ZTO and IGZO TFTs. Solution-deposited silicon dioxide is used as a barrier layer to subsequent PECVD silicon dioxide deposition, yielding ZTO TFT transfer curves showing that the dual-layer passivation process does not significantly alter ZTO TFT electrical characteristics. The second focus involves creating an adaptable back-end process compatible with flexible substrates. A detailed list of possible via formation techniques is presented with particular focus on non-traditional and adaptable techniques. Two of the discussed methods, “hydrophobic surface treatment”and “printed local insulator,” are demonstrated and proven effective. The third focus is printing AOS TFT channel layers in order to create an adaptable and additive front-end integrated circuit fabrication scheme. Printed zinc indium aluminum oxide (ZIAO) and indium gallium zinc oxide (IGZO) channel layers are demonstrated using a SonoPlot piezoelectric printing system. Finally, challenges associated with printing electronic

  15. Novel silane and disilane precursors to amorphous semiconductors. Annual report, 1 April 1985-31 March 1986

    SciTech Connect

    Pernisz, U.; Sharp, K.

    1986-08-01

    This report describes the preparation and characterization of amorphous fluorohydrogenated silicon thin films. The novel approach lies in the use of fluorinated silanes as film precursors. This method has the advantages of well-defined initial ratios of hydrogen and fluorine and a greatly reduced hazards in the handling of the gas. Fluorine derivatives of both silane and disilane were synthesized. A conventional method, glow discharge (or plasma-enhanced chemical vapor deposition), was employed to prepare amorphous silicon on glass and Si wafers. The electrical characterization of the material prepared from difluorosilane (the main precursor during the contract period covered in this report) showed that the a-Si:H:F films obtained are of solar-grade semiconductor quality and can be doped to p- and n-type material with diborane and phosphine.

  16. Controlled Chemical Doping of Semiconductor Nanocrystals Using Redox Buffers

    SciTech Connect

    Engel, Jesse H.; Surendranath, Yogesh; Alivisatos, Paul

    2013-07-20

    Semiconductor nanocrystal solids are attractive materials for active layers in next-generation optoelectronic devices; however, their efficient implementation has been impeded by the lack of precise control over dopant concentrations. Herein we demonstrate a chemical strategy for the controlled doping of nanocrystal solids under equilibrium conditions. Exposing lead selenide nanocrystal thin films to solutions containing varying proportions of decamethylferrocene and decamethylferrocenium incrementally and reversibly increased the carrier concentration in the solid by 2 orders of magnitude from their native values. This application of redox buffers for controlled doping provides a new method for the precise control of the majority carrier concentration in porous semiconductor thin films.

  17. Nanoscale doping of compound semiconductors by solid phase dopant diffusion

    NASA Astrophysics Data System (ADS)

    Ahn, Jaehyun; Chou, Harry; Koh, Donghyi; Kim, Taegon; Roy, Anupam; Song, Jonghan; Banerjee, Sanjay K.

    2016-03-01

    Achieving damage-free, uniform, abrupt, ultra-shallow junctions while simultaneously controlling the doping concentration on the nanoscale is an ongoing challenge to the scaling down of electronic device dimensions. Here, we demonstrate a simple method of effectively doping ΙΙΙ-V compound semiconductors, specifically InGaAs, by a solid phase doping source. This method is based on the in-diffusion of oxygen and/or silicon from a deposited non-stoichiometric silicon dioxide (SiOx) film on InGaAs, which then acts as donors upon activation by annealing. The dopant profile and concentration can be controlled by the deposited film thickness and thermal annealing parameters, giving active carrier concentration of 1.4 × 1018 cm-3. Our results also indicate that conventional silicon based processes must be carefully reviewed for compound semiconductor device fabrication to prevent unintended doping.

  18. Metal-doped semiconductor nanoparticles and methods of synthesis thereof

    NASA Technical Reports Server (NTRS)

    Ren, Zhifeng (Inventor); Chen, Gang (Inventor); Poudel, Bed (Inventor); Kumar, Shankar (Inventor); Wang, Wenzhong (Inventor); Dresselhaus, Mildred (Inventor)

    2009-01-01

    The present invention generally relates to binary or higher order semiconductor nanoparticles doped with a metallic element, and thermoelectric compositions incorporating such nanoparticles. In one aspect, the present invention provides a thermoelectric composition comprising a plurality of nanoparticles each of which includes an alloy matrix formed of a Group IV element and Group VI element and a metallic dopant distributed within the matrix.

  19. Metal-doped semiconductor nanoparticles and methods of synthesis thereof

    DOEpatents

    Ren, Zhifeng; Chen, Gang; Poudel, Bed; Kumar, Shankar; Wang, Wenzhong; Dresselhaus, Mildred

    2009-09-08

    The present invention generally relates to binary or higher order semiconductor nanoparticles doped with a metallic element, and thermoelectric compositions incorporating such nanoparticles. In one aspect, the present invention provides a thermoelectric composition comprising a plurality of nanoparticles each of which includes an alloy matrix formed of a Group IV element and Group VI element and a metallic dopant distributed within the matrix.

  20. OPTICAL AND DYNAMIC PROPERTIES OF UNDOPED AND DOPED SEMICONDUCTOR NANOSTRUCTURES

    SciTech Connect

    Grant, C D; Zhang, J Z

    2007-09-28

    This chapter provides an overview of some recent research activities on the study of optical and dynamic properties of semiconductor nanomaterials. The emphasis is on unique aspects of these properties in nanostructures as compared to bulk materials. Linear, including absorption and luminescence, and nonlinear optical as well as dynamic properties of semiconductor nanoparticles are discussed with focus on their dependence on particle size, shape, and surface characteristics. Both doped and undoped semiconductor nanomaterials are highlighted and contrasted to illustrate the use of doping to effectively alter and probe nanomaterial properties. Some emerging applications of optical nanomaterials are discussed towards the end of the chapter, including solar energy conversion, optical sensing of chemicals and biochemicals, solid state lighting, photocatalysis, and photoelectrochemistry.

  1. Spinodal nanodecomposition in semiconductors doped with transition metals

    NASA Astrophysics Data System (ADS)

    Dietl, T.; Sato, K.; Fukushima, T.; Bonanni, A.; Jamet, M.; Barski, A.; Kuroda, S.; Tanaka, M.; Hai, Pham Nam; Katayama-Yoshida, H.

    2015-10-01

    This review presents the recent progress in computational materials design, experimental realization, and control methods of spinodal nanodecomposition under three- and two-dimensional crystal-growth conditions in spintronic materials, such as magnetically doped semiconductors. The computational description of nanodecomposition, performed by combining first-principles calculations with kinetic Monte Carlo simulations, is discussed together with extensive electron microscopy, synchrotron radiation, scanning probe, and ion beam methods that have been employed to visualize binodal and spinodal nanodecomposition (chemical phase separation) as well as nanoprecipitation (crystallographic phase separation) in a range of semiconductor compounds with a concentration of transition metal (TM) impurities beyond the solubility limit. The role of growth conditions, codoping by shallow impurities, kinetic barriers, and surface reactions in controlling the aggregation of magnetic cations is highlighted. According to theoretical simulations and experimental results the TM-rich regions appear in the form of either nanodots (the dairiseki phase) or nanocolumns (the konbu phase) buried in the host semiconductor. Particular attention is paid to Mn-doped group III arsenides and antimonides, TM-doped group III nitrides, Mn- and Fe-doped Ge, and Cr-doped group II chalcogenides, in which ferromagnetic features persisting up to above room temperature correlate with the presence of nanodecomposition and account for the application-relevant magneto-optical and magnetotransport properties of these compounds. Finally, it is pointed out that spinodal nanodecomposition can be viewed as a new class of bottom-up approach to nanofabrication.

  2. Spin Hall Effect in Doped Semiconductor Structures

    NASA Astrophysics Data System (ADS)

    Tse, Wang-Kong; Das Sarma, Sankar

    2006-03-01

    We present a microscopic theory of the extrinsic spin Hall effect based on the diagrammatic perturbation theory. Side-jump (SJ) and skew-scattering (SS) contributions are explicitly taken into account to calculate the spin Hall conductivity, and we show their effects scale as σxy^SJ/σxy^SS ˜(/τ)/ɛF, where τ being the transport relaxation time. Motivated by recent experimental work we apply our theory to n-doped and p-doped 3D and 2D GaAs structures, obtaining analytical formulas for the SJ and SS contributions. Moreover, the ratio of the spin Hall conductivity to longitudinal conductivity is found as σs/σc˜10-3-10-4, in reasonable agreement with the recent experimental results of Kato et al. [Science 306, 1910 (2004)] in n-doped 3D GaAs system.

  3. Carrier scattering by native defects in heavily doped semiconductors

    SciTech Connect

    Walukiewicz, W. Materials and Chemical Sciences Division, Lawrence Berkeley Laboratory, 1 Cyclotron Road, Berkeley, CA )

    1990-05-15

    Calculations of the effect of charged native defects on carrier mobility in semiconductors are presented. The concentrations of native defects are calculated within the framework of the recently proposed amphoteric-native-defect model. The model provides a simple rule for identification of semiconductor systems in which defect scattering is important. It is shown that native-defect scattering is a dominant mechanism limiting electron mobilities in heavily doped {ital n}-type GaAs. It is also shown that native defects do not play any significant role in {ital p}-type GaAs.

  4. Ion-beam amorphization of semiconductors: A physical model based on the amorphous pocket population

    SciTech Connect

    Mok, K.R.C.; Jaraiz, M.; Martin-Bragado, I.; Rubio, J.E.; Castrillo, P.; Pinacho, R.; Barbolla, J.; Srinivasan, M.P.

    2005-08-15

    We introduce a model for damage accumulation up to amorphization, based on the ion-implant damage structures commonly known as amorphous pockets. The model is able to reproduce the silicon amorphous-crystalline transition temperature for C, Si, and Ge ion implants. Its use as an analysis tool reveals an unexpected bimodal distribution of the defect population around a characteristic size, which is larger for heavier ions. The defect population is split in both size and composition, with small, pure interstitial and vacancy clusters below the characteristic size, and amorphous pockets with a balanced mixture of interstitials and vacancies beyond that size.

  5. Transport in two-dimensional modulation-doped semiconductor structures

    NASA Astrophysics Data System (ADS)

    Das Sarma, S.; Hwang, E. H.; Kodiyalam, S.; Pfeiffer, L. N.; West, K. W.

    2015-05-01

    We develop a theory for the maximum achievable mobility in modulation-doped 2D GaAs-AlGaAs semiconductor structures by considering the momentum scattering of the 2D carriers by the remote ionized dopants, which must invariably be present in order to create the 2D electron gas at the GaAs-AlGaAs interface. The minimal model, assuming first-order Born scattering by random quenched remote dopant ions as the only scattering mechanism, gives a mobility much lower (by a factor of 3 or more) than that observed experimentally in many ultrahigh-mobility modulation-doped 2D systems, establishing convincingly that the model of uncorrelated scattering by independent random remote quenched dopant ions is often unable to describe the physical system quantitively. We theoretically establish that the consideration of spatial correlations in the remote dopant distribution can enhance the mobility by (up to) several orders of magnitudes in experimental samples. The precise calculation of the carrier mobility in ultrapure modulation-doped 2D semiconductor structures thus depends crucially on the unknown spatial correlations among the dopant ions in the doping layer which may manifest sample to sample variations even for nominally identical sample parameters (i.e., density, well width, etc.), depending on the details of the modulation-doping growth conditions.

  6. Magnetism in dilute iron doped YN semiconductors

    NASA Astrophysics Data System (ADS)

    Sharma, Ramesh; Dwievdi, Shalini; Sharma, Yamini

    2016-05-01

    The full potential linearized augmented plane-wave (FP-LAPW) scheme of computation is used to explore the electronic and magnetic properties of Fe doped into YN. Band structure calculations show that YN is a semicon ductor with a narrow indirect band gap of 0.08 eV along D-X direction. Optical properties such as reflectivity, absorption coefficient are reported and are discussed on the basis of corresponding electronic structure. Spin polarized results indicate that the ground state of Y1-xFexN (x=0.06, 0.12, 0.25) is ferromagnetic with a high moment on Fe-atom and zero moment on Y and N atoms, except in the case of 25 % doping. A discussion of the transport properties of YN and Y1-xFexN is given in order to get insights of the Fe substitution effects.

  7. Spin Hall Effect in Doped Semiconductor Structures

    NASA Astrophysics Data System (ADS)

    Tse, Wang-Kong; Das Sarma, S.

    2006-02-01

    In this Letter we present a microscopic theory of the extrinsic spin Hall effect based on the diagrammatic perturbation theory. Side-jump and skew-scattering contributions are explicitly taken into account to calculate the spin Hall conductivity, and we show that their effects scale as σxySJ/σxySS˜(ℏ/τ)/ɛF, with τ being the transport relaxation time. Motivated by recent experimental work we apply our theory to n- and p-doped 3D and 2D GaAs structures, obtaining σs/σc˜10-3-10-4, where σs(c) is the spin Hall (charge) conductivity, which is in reasonable agreement with the recent experimental results of Kato et al. [Science 306, 1910 (2004)]SCIEAS0036-807510.1126/science.1105514 in n-doped 3D GaAs system.

  8. Metal-insulator transition in films of doped semiconductor nanocrystals.

    PubMed

    Chen, Ting; Reich, K V; Kramer, Nicolaas J; Fu, Han; Kortshagen, Uwe R; Shklovskii, B I

    2016-03-01

    To fully deploy the potential of semiconductor nanocrystal films as low-cost electronic materials, a better understanding of the amount of dopants required to make their conductivity metallic is needed. In bulk semiconductors, the critical concentration of electrons at the metal-insulator transition is described by the Mott criterion. Here, we theoretically derive the critical concentration nc for films of heavily doped nanocrystals devoid of ligands at their surface and in direct contact with each other. In the accompanying experiments, we investigate the conduction mechanism in films of phosphorus-doped, ligand-free silicon nanocrystals. At the largest electron concentration achieved in our samples, which is half the predicted nc, we find that the localization length of hopping electrons is close to three times the nanocrystals diameter, indicating that the film approaches the metal-insulator transition. PMID:26618885

  9. Metal-insulator transition in films of doped semiconductor nanocrystals

    NASA Astrophysics Data System (ADS)

    Chen, Ting; Reich, K. V.; Kramer, Nicolaas J.; Fu, Han; Kortshagen, Uwe R.; Shklovskii, B. I.

    2016-03-01

    To fully deploy the potential of semiconductor nanocrystal films as low-cost electronic materials, a better understanding of the amount of dopants required to make their conductivity metallic is needed. In bulk semiconductors, the critical concentration of electrons at the metal-insulator transition is described by the Mott criterion. Here, we theoretically derive the critical concentration nc for films of heavily doped nanocrystals devoid of ligands at their surface and in direct contact with each other. In the accompanying experiments, we investigate the conduction mechanism in films of phosphorus-doped, ligand-free silicon nanocrystals. At the largest electron concentration achieved in our samples, which is half the predicted nc, we find that the localization length of hopping electrons is close to three times the nanocrystals diameter, indicating that the film approaches the metal-insulator transition.

  10. Nonlinear switching in semiconductor (CdSSe) doped glass

    NASA Astrophysics Data System (ADS)

    Sergio Bezerra Sombra, A.

    1993-10-01

    Optical nonlinear switching due to increasing absorption has been observed in a nondegenerate pump and probe experiment in Semiconductor (CdSSe) Doped Glass (SDG). With the proper choice of the parameters, like modulation frequency and light intensity, one hundred percent modulation in a probe laser induced by a strong pump laser was obtained at room temperature. Two nonlinear regimes were observed, with saturated pump absorption being dominant at high pump power.

  11. Chemical vapor deposition of boron-doped hydrogenated amorphous silicon

    SciTech Connect

    Ellis F.B. Jr.; Delahoy, A.E.

    1985-07-15

    Deposition conditions and film properties for a variety of boron-doped hydrogenated amorphous silicon films and silicon-carbon films produced by chemical vapor deposition (CVD) are discussed. Deposition gases include monosilane, disilane, trisilane, and acetylene. Two types of optically wide band-gap p layers are obtained. One of these window p layers (without carbon) has been extensively tested in photovoltaic devices. Remarkably, this p layer can be deposited between about 200 to 300 /sup 0/C. A typical open circuit voltage in an all CVD p-i-n device is 0.70--0.72 V, and in a hybrid device where the i and n layers are deposited by glow discharge, 0.8--0.83 V.

  12. FY06 Annual Report: Amorphous Semiconductors for Gamma Radiation Detection (ASGRAD)

    SciTech Connect

    Johnson, Bradley R.; Riley, Brian J.; Crum, Jarrod V.; Sundaram, S. K.; Henager, Charles H.; Zhang, Yanwen; Shutthanandan, V.

    2007-01-01

    We describe progress in the development of new materials for portable, room-temperature, gamma-radiation detection at Pacific Northwest National Laboratory at the Hanford Site in Washington State. High Z, high resistivity, amorphous semiconductors are being designed for use as solid-state detectors at near ambient temperatures; principles of operation are analogous to single-crystal semiconducting detectors. Amorphous semiconductors have both advantages and disadvantages compared to single crystals, and this project is developing methods to mitigate technical problems and design optimized material for gamma detection. Several issues involved in the fabrication of amorphous semiconductors are described, including reaction thermodynamics and kinetics, the development of pyrolytic coating, and the synthesis of ingots. The characterization of amorphous semiconductors is described, including sectioning and polishing protocols, optical microscopy, X-ray diffraction, scanning electron microscopy, optical spectroscopy, particle-induced X-ram emission, Rutherford backscattering, and electrical testing. Then collaboration with the University of Illinois at Urbana-Champaign is discussed in the areas of Hall-effect measurements and current voltage data. Finally, we discuss the strategy for continuing the program.

  13. Hybrid method of making an amorphous silicon P-I-N semiconductor device

    DOEpatents

    Moustakas, Theodore D.; Morel, Don L.; Abeles, Benjamin

    1983-10-04

    The invention is directed to a hydrogenated amorphous silicon PIN semiconductor device of hybrid glow discharge/reactive sputtering fabrication. The hybrid fabrication method is of advantage in providing an ability to control the optical band gap of the P and N layers, resulting in increased photogeneration of charge carriers and device output.

  14. Symmetry induced semimetal-semiconductor transition in doped graphene

    PubMed Central

    Sirikumara, Hansika I.; Putz, Erika; Al-Abboodi, Mohammed; Jayasekera, Thushari

    2016-01-01

    Substitutional chemical doping is one way of introducing an electronic bandgap in otherwise semimetallic graphene. A small change in dopant arrangement can convert graphene from a semiconducting to a semimetallic state. Based on ab initio Density Functional Theory calculations, we discuss the electron structure of BN-doped graphene with Bravais and non-Bravais lattice-type defect patterns, identifying semiconducting/semimetallic configurations. Semimetallic behavior of graphene with non-Bravais lattice-type defect patterns can be explained by a phase cancellation in the scattering amplitude. Our investigation reveals for the first time that the symmetry of defect islands and the periodicity of defect modulation limit the phase cancellation which controls the semimetal-semiconductor transition in doped graphene. PMID:26781061

  15. Symmetry induced semimetal-semiconductor transition in doped graphene.

    PubMed

    Sirikumara, Hansika I; Putz, Erika; Al-Abboodi, Mohammed; Jayasekera, Thushari

    2016-01-01

    Substitutional chemical doping is one way of introducing an electronic bandgap in otherwise semimetallic graphene. A small change in dopant arrangement can convert graphene from a semiconducting to a semimetallic state. Based on ab initio Density Functional Theory calculations, we discuss the electron structure of BN-doped graphene with Bravais and non-Bravais lattice-type defect patterns, identifying semiconducting/semimetallic configurations. Semimetallic behavior of graphene with non-Bravais lattice-type defect patterns can be explained by a phase cancellation in the scattering amplitude. Our investigation reveals for the first time that the symmetry of defect islands and the periodicity of defect modulation limit the phase cancellation which controls the semimetal-semiconductor transition in doped graphene. PMID:26781061

  16. Crystallization and doping of amorphous silicon on low temperature plastic

    DOEpatents

    Kaschmitter, J.L.; Truher, J.B.; Weiner, K.H.; Sigmon, T.W.

    1994-09-13

    A method or process of crystallizing and doping amorphous silicon (a-Si) on a low-temperature plastic substrate using a short pulsed high energy source in a selected environment, without heat propagation and build-up in the substrate is disclosed. The pulsed energy processing of the a-Si in a selected environment, such as BF3 and PF5, will form a doped micro-crystalline or poly-crystalline silicon (pc-Si) region or junction point with improved mobilities, lifetimes and drift and diffusion lengths and with reduced resistivity. The advantage of this method or process is that it provides for high energy materials processing on low cost, low temperature, transparent plastic substrates. Using pulsed laser processing a high (>900 C), localized processing temperature can be achieved in thin films, with little accompanying temperature rise in the substrate, since substrate temperatures do not exceed 180 C for more than a few microseconds. This method enables use of plastics incapable of withstanding sustained processing temperatures (higher than 180 C) but which are much lower cost, have high tolerance to ultraviolet light, have high strength and good transparency, compared to higher temperature plastics such as polyimide. 5 figs.

  17. Crystallization and doping of amorphous silicon on low temperature plastic

    DOEpatents

    Kaschmitter, James L.; Truher, Joel B.; Weiner, Kurt H.; Sigmon, Thomas W.

    1994-01-01

    A method or process of crystallizing and doping amorphous silicon (a-Si) on a low-temperature plastic substrate using a short pulsed high energy source in a selected environment, without heat propagation and build-up in the substrate. The pulsed energy processing of the a-Si in a selected environment, such as BF3 and PF5, will form a doped micro-crystalline or poly-crystalline silicon (pc-Si) region or junction point with improved mobilities, lifetimes and drift and diffusion lengths and with reduced resistivity. The advantage of this method or process is that it provides for high energy materials processing on low cost, low temperature, transparent plastic substrates. Using pulsed laser processing a high (>900.degree. C.), localized processing temperature can be achieved in thin films, with little accompanying temperature rise in the substrate, since substrate temperatures do not exceed 180.degree. C. for more than a few microseconds. This method enables use of plastics incapable of withstanding sustained processing temperatures (higher than 180.degree. C.) but which are much lower cost, have high tolerance to ultraviolet light, have high strength and good transparency, compared to higher temperature plastics such as polyimide.

  18. Charge storage characteristics and tunneling mechanism of amorphous Ge-doped HfOx films

    NASA Astrophysics Data System (ADS)

    Qiu, X. Y.; Zhang, S. Y.; Zhang, T.; Wang, R. X.; Li, L. T.; Zhang, Y.; Dai, J. Y.

    2016-09-01

    Amorphous Ge-doped HfOx films have been deposited on p-Si(100) substrates by means of RF magnetron sputtering. Microstructural investigations reveal the partial oxidation of doped Ge atoms in the amorphous HfOx matrix and the existence of HfSiOx interfacial layer. Capacitance-voltage hysteresis of the Ag-/Ge-doped HfOx/Si/Ag memory capacitor exhibits a memory window of 3.15 V which can maintain for >5 × 104 cycles. Current-voltage characteristics reveal that Poole-Frenkel tunneling is responsible for electron transport in the Ge-doped HfOx film.

  19. Optimal doping control of magnetic semiconductors via subsurfactant epitaxy

    SciTech Connect

    Zeng, Changgan; Zhang, Zhenyu; van Benthem, Klaus; Chisholm, Matthew F; Weitering, Harm H

    2008-02-01

    Dilute magnetic semiconductors (DMS) with high ferromagnetic ordering temperatures (T{sub c}) have vast potential for advancing spin-based electronics or 'spintronics'. To date, achieving high-T{sub c} DMS typically required doping levels of order 5%. Such high doping levels inevitably compromise the structural homogeneity and carrier mobility of the DMS. Here, we establish 'subsurfactant epitaxy' as a novel kinetic pathway for synthesizing Mn-doped germanium with T{sub c} much higher than room temperature, at dramatically reduced doping levels. This is accomplished by optimal control of the diffusion kinetics of the dopant atoms near the growth front in two separate deposition steps. The first involves a submonolayer dose of Mn on Ge(100) at low temperature, which populates subsurface interstitial sites with Mn while suppressing lateral Mn diffusion and clustering. The second step involves epitaxial growth of Ge at elevated temperature, taking advantage of the strong floating ability of the interstitial Mn dopants towards the newly defined subsurface sites at the growth front. Most remarkably, the Mn dopants trapped inside the film are uniformly distributed at substitutional sites, and the resulting film exhibits ferromagnetism above 400 K at the nominal doping level of only 0.2%.

  20. Conductivity (ac and dc) in III-V amorphous semiconductors and chalcogenide glasses

    NASA Astrophysics Data System (ADS)

    Hauser, J. J.

    1985-02-01

    Variable-range hopping, as evidenced by a resistivity proportional to exp(T-1/4), has been induced in many III-V amorphous semiconductors (InSb, AlSb, and GaAs) and even in chalcogenide glasses (As2Te3, As2Te3-xSex, and GeTe) by depositing films at 77 K. It is therefore remarkable that the same procedure failed to generate variable-range hopping in GaSb, which is one of the less ionic III-V semiconductors. Besides differences in the dc conductivity, there are also different behaviors in the ac conductivity of amorphous semiconductors. The low-temperature ac conductivity of all amorphous semiconductors is proportional to ωsTn with s~=1 and n<1, which is consistent with a model of correlated barrier hopping of electron pairs between paired and random defects. However, in the case of a-SiO2 and a-GeSe2 one finds, in addition, that the capacitance obeys the scaling relation C=A ln(Tω-1), which would suggest a conduction mechanism by tunneling relaxation. Furthermore, this scaling relation cannot be fitted to the data for a-As2Te3, a-InSb, and a-GaSb although the functional dependence of C on T and ω are similar.

  1. Synthesis of Doped Semiconductor Nanocrystals and Conductive Coatings

    NASA Astrophysics Data System (ADS)

    Wills, Andrew Wilke

    Semiconductor nanocrystals are an intriguing class of materials because of their size-tunable properties. This makes them promising for future optoelectronic devices such as solar cells and light emitting diodes. Realization of these devices, however, requires precise control of the flow of electricity through the particles. In bulk semiconductors, this is achieved by using materials with few unintentional defects, then intentionally adding particular defects or dopants to alter the semiconductor's electronic properties. In contrast, the addition of electrically active dopants has scarcely been demonstrated in semiconductor nanocrystals, and charge transport is hindered by the barrier of electron hopping between particles. The goal of this thesis, therefore, is to discover new methods to control charge transport in nanocrystals. It divides into three major thrusts: 1) the investigation of the doping process in semiconductor nanocrystals, 2) the invention of new synthetic methods to incorporate electrically active dopants into semiconductor nanocrystals, and 3) the invention of a new nanocrystal surface coating that aids processing of nanocrystals into devices but can be removed to enhance charge transport between particles. The first objective is achieved by the comparison of four different precursors that have been used to dope Mn into nanocrystals. Experiments show that dimethylmanganese incorporates efficiently into ZnSe nanocrystals while other precursors are less efficient and sometimes lower the quality of the nanocrystals produced. The second goal is met by the application of a core-shell synthetic strategy to the incorporation of non-isovalent impurities (Al and In) into CdSe nanocrystals. By separating the three steps of nucleation, dopant binding, and growth, each step can be optimized so that doping is achieved and high quality particles are produced. Detailed characterization shows dopant incorporation and local environment, while transistor

  2. N-doping of organic semiconductors by bis-metallosandwich compounds

    DOEpatents

    Barlow, Stephen; Qi, Yabing; Kahn, Antoine; Marder, Seth; Kim, Sang Bok; Mohapatra, Swagat K.; Guo, Song

    2016-01-05

    The various inventions disclosed, described, and/or claimed herein relate to the field of methods for n-doping organic semiconductors with certain bis-metallosandwich compounds, the doped compositions produced, and the uses of the doped compositions in organic electronic devices. Metals can be manganese, rhenium, iron, ruthenium, osmium, rhodium, or iridium. Stable and efficient doping can be achieved.

  3. Amorphous Semiconductor Nanowires Created by Site-Specific Heteroatom Substitution with Significantly Enhanced Photoelectrochemical Performance.

    PubMed

    He, Ting; Zu, Lianhai; Zhang, Yan; Mao, Chengliang; Xu, Xiaoxiang; Yang, Jinhu; Yang, Shihe

    2016-08-23

    Semiconductor nanowires that have been extensively studied are typically in a crystalline phase. Much less studied are amorphous semiconductor nanowires due to the difficulty for their synthesis, despite a set of characteristics desirable for photoelectric devices, such as higher surface area, higher surface activity, and higher light harvesting. In this work of combined experiment and computation, taking Zn2GeO4 (ZGO) as an example, we propose a site-specific heteroatom substitution strategy through a solution-phase ions-alternative-deposition route to prepare amorphous/crystalline Si-incorporated ZGO nanowires with tunable band structures. The substitution of Si atoms for the Zn or Ge atoms distorts the bonding network to a different extent, leading to the formation of amorphous Zn1.7Si0.3GeO4 (ZSGO) or crystalline Zn2(GeO4)0.88(SiO4)0.12 (ZGSO) nanowires, respectively, with different bandgaps. The amorphous ZSGO nanowire arrays exhibit significantly enhanced performance in photoelectrochemical water splitting, such as higher and more stable photocurrent, and faster photoresponse and recovery, relative to crystalline ZGSO and ZGO nanowires in this work, as well as ZGO photocatalysts reported previously. The remarkable performance highlights the advantages of the ZSGO amorphous nanowires for photoelectric devices, such as higher light harvesting capability, faster charge separation, lower charge recombination, and higher surface catalytic activity. PMID:27494205

  4. Uniform Doping in Quantum-Dots-Based Dilute Magnetic Semiconductor.

    PubMed

    Saha, Avijit; Shetty, Amitha; Pavan, A R; Chattopadhyay, Soma; Shibata, Tomohiro; Viswanatha, Ranjani

    2016-07-01

    Effective manipulation of magnetic spin within a semiconductor leading to a search for ferromagnets with semiconducting properties has evolved into an important field of dilute magnetic semiconductors (DMS). Although a lot of research is focused on understanding the still controversial origin of magnetism, efforts are also underway to develop new materials with higher magnetic temperatures for spintronics applications. However, so far, efforts toward quantum-dots(QDs)-based DMS materials are plagued with problems of phase separation, leading to nonuniform distribution of dopant ions. In this work, we have developed a strategy to synthesize highly crystalline, single-domain DMS system starting from a small magnetic core and allowing it to diffuse uniformly inside a thick CdS semiconductor matrix and achieve DMS QDs. X-ray absorption fine structure (XAFS) spectroscopy and energy-dispersive X-ray spectroscopy-scanning transmission electron microscopy (STEM-EDX) indicates the homogeneous distribution of magnetic impurities inside the semiconductor QDs leading to superior magnetic property. Further, the versatility of this technique was demonstrated by obtaining ultra large particles (∼60 nm) with uniform doping concentration as well as demonstrating the high quality magnetic response. PMID:27295453

  5. High gain photoconductive semiconductor switch having tailored doping profile zones

    SciTech Connect

    Baca, Albert G.; Loubriel, Guillermo M.; Mar, Alan; Zutavern, Fred J; Hjalmarson, Harold P.; Allerman, Andrew A.; Zipperian, Thomas E.; O'Malley, Martin W.; Helgeson, Wesley D.; Denison, Gary J.; Brown, Darwin J.; Sullivan, Charles T.; Hou, Hong Q.

    2001-01-01

    A photoconductive semiconductor switch with tailored doping profile zones beneath and extending laterally from the electrical contacts to the device. The zones are of sufficient depth and lateral extent to isolate the contacts from damage caused by the high current filaments that are created in the device when it is turned on. The zones may be formed by etching depressions into the substrate, then conducting epitaxial regrowth in the depressions with material of the desired doping profile. They may be formed by surface epitaxy. They may also be formed by deep diffusion processes. The zones act to reduce the energy density at the contacts by suppressing collective impact ionization and formation of filaments near the contact and by reducing current intensity at the contact through enhanced current spreading within the zones.

  6. All-optical switching in semiconductor-doped nonlinear fibers

    NASA Astrophysics Data System (ADS)

    Donkor, Eric

    1999-11-01

    Optical switching devices that can perform at picosecond to femtosecond speeds are on demand because of interest to develop multi-gigabit, multi-user, optical networks. Two fundamental design issues are the choice of nonlinear material as the active medium for the switch and the switching architecture. Wave guide based switches designed with silica fiber have demonstrated ultra-fast switching up to femtosecond speeds. Figure 1 shows the switching speed versus power-length product for different types of materials. At the two extremes are rare-earth doped, and silica. Rare-earth doped materials have the smallest power-length product of about 10 W-cm, but also have the least switching speed. At the other extreme, silica has the fastest switching speed of 1013 Hz but also has the largest power-length product of 6 kW-cm. Semiconductor-doped glasses (SDG) and metal-doped glasses appear to have a good compromise between switching speed and power-length product. There is therefore interest to research such optical materials, and novel switching architectures that can simultaneously down-scale device geometry, and power requirements for switching.

  7. Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier

    DOEpatents

    Carlson, David E.; Wronski, Christopher R.

    1979-01-01

    A Schottky barrier amorphous silicon solar cell incorporating a thin highly doped p-type region of hydrogenated amorphous silicon disposed between a Schottky barrier high work function metal and the intrinsic region of hydrogenated amorphous silicon wherein said high work function metal and said thin highly doped p-type region forms a surface barrier junction with the intrinsic amorphous silicon layer. The thickness and concentration of p-type dopants in said p-type region are selected so that said p-type region is fully ionized by the Schottky barrier high work function metal. The thin highly doped p-type region has been found to increase the open circuit voltage and current of the photovoltaic device.

  8. Leakage current in high-purity germanium detectors with amorphous semiconductor contacts

    NASA Astrophysics Data System (ADS)

    Looker, Q.; Amman, M.; Vetter, K.

    2015-03-01

    Amorphous semiconductor electrical contacts on high-purity Ge radiation detectors have become a valuable technology because they are simple to fabricate, result in thin dead layers, block both electron and hole injection, and can readily be finely segmented as needed for applications requiring imaging or particle tracking. Though significant numbers of detectors have been successfully produced for a variety of applications using the amorphous semiconductor contact technology, there remains a need to better understand the dependence of performance characteristics, particularly leakage current, on the fabrication process parameters so that the performance can be better optimized. To this end, we have performed a systematic study of leakage current on RF-sputter-deposited amorphous-Ge (a-Ge) and amorphous-Si (a-Si) contacts as a function of process and operational parameters including sputter gas pressure and composition, number of detector temperature cycles, and time spent at room temperature. The study focused primarily on the current resulting from electron injection at the contact. Significant findings from the study include that a-Si produces lower electron injection than a-Ge, the time the detector spends at room temperature rather than the number of temperature cycles experienced by the detector is the primary factor associated with leakage current change when the detector is warmed, and the time stability of the a-Ge contact depends on the sputter gas pressure with a higher pressure producing more stable characteristics.

  9. Fabrication process development for high-purity germanium radiation detectors with amorphous semiconductor contacts

    NASA Astrophysics Data System (ADS)

    Looker, Quinn

    High-purity germanium (HPGe) radiation detectors are well established as a valuable tool in nuclear science, astrophysics, and nuclear security applications. HPGe detectors excel in gamma-ray spectroscopy, offering excellent energy resolution with large detector sizes for high radiation detection efficiency. Although a robust fabrication process has been developed, improvement is needed, especially in developing electrical contact and surface passivation technology for position-sensitive detectors. A systematic study is needed to understand how the detector fabrication process impacts detector performance and reliability. In order to provide position sensitivity, the electrical contacts are segmented to form multiple electrodes. This segmentation creates new challenges in the fabrication process and warrants consideration of additional detector effects related to the segmentation. A key area of development is the creation of the electrical contacts in a way that enables reliable operation, provides low electronic noise, and allows fine segmentation of electrodes, giving position sensitivity for radiation interactions in the detector. Amorphous semiconductor contacts have great potential to facilitate new HPGe detector designs by providing a thin, high-resistivity surface coating that is the basis for electrical contacts that block both electrons and holes and can easily be finely segmented. Additionally, amorphous semiconductor coatings form a suitable passivation layer to protect the HPGe crystal surface from contamination. This versatility allows a simple fabrication process for fully passivated, finely segmented detectors. However, the fabrication process for detectors with amorphous semiconductors is not as highly developed as for conventional technologies. The amorphous semiconductor layer properties can vary widely based on how they are created and these can translate into varying performance of HPGe detectors with these contacts. Some key challenges include

  10. Method of manufacturing semiconductor having group II-group VI compounds doped with nitrogen

    DOEpatents

    Compaan, Alvin D.; Price, Kent J.; Ma, Xianda; Makhratchev, Konstantin

    2005-02-08

    A method of making a semiconductor comprises depositing a group II-group VI compound onto a substrate in the presence of nitrogen using sputtering to produce a nitrogen-doped semiconductor. This method can be used for making a photovoltaic cell using sputtering to apply a back contact layer of group II-group VI compound to a substrate in the presence of nitrogen, the back coating layer being doped with nitrogen. A semiconductor comprising a group II-group VI compound doped with nitrogen, and a photovoltaic cell comprising a substrate on which is deposited a layer of a group II-group VI compound doped with nitrogen, are also included.

  11. Multiscale approach to the electronic structure of doped semiconductor surfaces

    NASA Astrophysics Data System (ADS)

    Sinai, Ofer; Hofmann, Oliver T.; Rinke, Patrick; Scheffler, Matthias; Heimel, Georg; Kronik, Leeor

    2015-02-01

    The inclusion of the global effects of semiconductor doping poses a unique challenge for first-principles simulations, because the typically low concentration of dopants renders an explicit treatment intractable. Furthermore, the width of the space-charge region (SCR) at charged surfaces often exceeds realistic supercell dimensions. Here, we present a multiscale technique that fully addresses these difficulties. It is based on the introduction of a charged sheet, mimicking the SCR-related field, along with free charge which mimics the bulk charge reservoir, such that the system is neutral overall. These augment a slab comprising "pseudoatoms" possessing a fractional nuclear charge matching the bulk doping concentration. Self-consistency is reached by imposing charge conservation and Fermi level equilibration between the bulk, treated semiclassically, and the electronic states of the slab, which are treated quantum-mechanically. The method, called CREST—the charge-reservoir electrostatic sheet technique—can be used with standard electronic structure codes. We validate CREST using a simple tight-binding model, which allows for comparison of its results with calculations encompassing the full SCR explicitly. Specifically, we show that CREST successfully predicts scenarios spanning the range from no to full Fermi level pinning. We then employ it with density functional theory, obtaining insight into the doping dependence of the electronic structures of the metallic "clean-cleaved" Si(111) surface and its semiconducting (2 ×1 ) reconstructions.

  12. Accurate calculation of field and carrier distributions in doped semiconductors

    NASA Astrophysics Data System (ADS)

    Yang, Wenji; Tang, Jianping; Yu, Hongchun; Wang, Yanguo

    2012-06-01

    We use the numerical squeezing algorithm(NSA) combined with the shooting method to accurately calculate the built-in fields and carrier distributions in doped silicon films (SFs) in the micron and sub-micron thickness range and results are presented in graphical form for variety of doping profiles under different boundary conditions. As a complementary approach, we also present the methods and the results of the inverse problem (IVP) - finding out the doping profile in the SFs for given field distribution. The solution of the IVP provides us the approach to arbitrarily design field distribution in SFs - which is very important for low dimensional (LD) systems and device designing. Further more, the solution of the IVP is both direct and much easy for all the one-, two-, and three-dimensional semiconductor systems. With current efforts focused on the LD physics, knowing of the field and carrier distribution details in the LD systems will facilitate further researches on other aspects and hence the current work provides a platform for those researches.

  13. Ionic Liquid Activation of Amorphous Metal-Oxide Semiconductors for Flexible Transparent Electronic Devices

    DOE PAGESBeta

    Pudasaini, Pushpa Raj; Noh, Joo Hyon; Wong, Anthony T.; Ovchinnikova, Olga S.; Haglund, Amanda V.; Dai, Sheng; Ward, Thomas Zac; Mandrus, David; Rack, Philip D.

    2016-02-09

    To begin this abstract, amorphous metal-oxide semiconductors offer the high carrier mobilities and excellent large-area uniformity required for high performance, transparent, flexible electronic devices; however, a critical bottleneck to their widespread implementation is the need to activate these materials at high temperatures which are not compatible with flexible polymer substrates. The highly controllable activation of amorphous indium gallium zinc oxide semiconductor channels using ionic liquid gating at room temperature is reported. Activation is controlled by electric field-induced oxygen migration across the ionic liquid-semiconductor interface. In addition to activation of unannealed devices, it is shown that threshold voltages of a transistormore » can be linearly tuned between the enhancement and depletion modes. Finally, the first ever example of transparent flexible thin film metal oxide transistor on a polyamide substrate created using this simple technique is demonstrated. Finally, this study demonstrates the potential of field-induced activation as a promising alternative to traditional postdeposition thermal annealing which opens the door to wide scale implementation into flexible electronic applications.« less

  14. Ab initio charge-carrier mobility model for amorphous molecular semiconductors

    NASA Astrophysics Data System (ADS)

    Massé, Andrea; Friederich, Pascal; Symalla, Franz; Liu, Feilong; Nitsche, Robert; Coehoorn, Reinder; Wenzel, Wolfgang; Bobbert, Peter A.

    2016-05-01

    Accurate charge-carrier mobility models of amorphous organic molecular semiconductors are essential to describe the electrical properties of devices based on these materials. The disordered nature of these semiconductors leads to percolative charge transport with a large characteristic length scale, posing a challenge to the development of such models from ab initio simulations. Here, we develop an ab initio mobility model using a four-step procedure. First, the amorphous morphology together with its energy disorder and intermolecular charge-transfer integrals are obtained from ab initio simulations in a small box. Next, the ab initio information is used to set up a stochastic model for the morphology and transfer integrals. This stochastic model is then employed to generate a large simulation box with modeled morphology and transfer integrals, which can fully capture the percolative charge transport. Finally, the charge-carrier mobility in this simulation box is calculated by solving a master equation, yielding a mobility function depending on temperature, carrier concentration, and electric field. We demonstrate the procedure for hole transport in two important molecular semiconductors, α -NPD and TCTA. In contrast to a previous study, we conclude that spatial correlations in the energy disorder are unimportant for α -NPD. We apply our mobility model to two types of hole-only α -NPD devices and find that the experimental temperature-dependent current density-voltage characteristics of all devices can be well described by only slightly decreasing the simulated energy disorder strength.

  15. Semiconductor-doped liquid-core optical fiber.

    PubMed

    Hreibi, Ali; Gérôme, Frédéric; Auguste, Jean-Louis; Zhang, Yu; Yu, William W; Blondy, Jean-Marc

    2011-05-01

    A semiconductor liquid-core optical fiber has been made by simply filling the hollow core of a capillary waveguide with nanoparticles suspended in toluene media. Under a low continuous optical power excitation at 532 nm, the emission of PbSe particles was clearly demonstrated in the infrared region and then partially maintained in the core of the fiber by the total internal reflection mechanism. Finally, due to the guided propagation, which results in multiple absorption effects, a linear shift of the emission peak toward longer wavelengths was observed (~0.32 nm/cm). As a proof of concept, this original demonstration of visible-to-infrared conversion could lead to the development of active fibered devices at wavelengths not covered by the conventional rare-earth ion doping. PMID:21540972

  16. n-type conductivity in Si-doped amorphous AlN: an ab initio investigation

    NASA Astrophysics Data System (ADS)

    Durandurdu, Murat

    2016-04-01

    We report the electronic structure and topology of a heavily Si-doped amorphous aluminium nitride (Al37.5Si12.5N50) using ab initio simulations. The amorphous Al37.5Si12.5N50 system is found to be structurally similar to pure amorphous aluminium nitride. It has an average coordination number of about 3.9 and exhibits a small amount of Si-Si homopolar bonds. The formation of Si-Al bonds is not very favourable. Electronic structure calculations reveal that the Si doping has a negligible effect on the band gap width but causes delocalization of the valence band tail states and a shift of the Fermi level towards the conduction band. Thus, amorphous Al37.5Si12.5N50 alloys show n-type conductivity.

  17. Structural and electronic properties of amorphous ternary and quaternary oxide semiconductors

    NASA Astrophysics Data System (ADS)

    Sanders, K. Nocona; Khanal, Rabi; Medvedeva, Julia E.

    Amorphous structures of several multi-cation wide-bandgap oxides (In-Ga-Zn-O, In-Sc-O, In-Y-O, and In-La-O) were obtained via first-principles molecular dynamics liquid-quench approach using different cooling rates and different oxygen and metal compositions. A detailed comparison of the structural properties, namely, the distribution of metal-oxygen (M-O) and metal-metal (M-M) distances, bond angles, and coordination, allows us to determine how the MO polyhedra network is affected by the crystalline-to-amorphous transition. Furthermore, the role of oxygen non-stoichiometry in defect formation is investigated. Specifically, local structural defects associated with severe distortions in the metal-oxygen polyhedra, such as under-coordinated metal and oxygen atoms, or M-M bonds, appear in the electronic band structure of amorphous oxides. Both carrier-generating defects and carrier trapping/scattering defects are identified. The results help determine the optimal composition and preparation conditions (i.e., oxygen partial pressure, deposition temperature) in order to achieve the desired properties of the technologically-appealing amorphous oxide semiconductors. NSF-MRSEC.

  18. Carbon doping of III-V compound semiconductors

    SciTech Connect

    Moll, A.J.

    1994-09-01

    Focus of the study is C acceptor doping of GaAs, since C diffusion coefficient is at least one order of magnitude lower than that of other common p-type dopants in GaAs. C ion implantation results in a concentration of free holes in the valence band < 10% of that of the implanted C atoms for doses > 10{sup 14}/cm{sup 2}. Rutherford backscattering, electrical measurements, Raman spectroscopy, and Fourier transform infrared spectroscopy were amonth the techniques used. Ga co-implantation increased the C activation in two steps: first, the additional radiation damage creates vacant As sites that the implanted C can occupy, and second, it maintains the stoichiometry of the implanted layer, reducing the number of compensating native defects. In InP, the behavior of C was different from that in GaAs. C acts as n-type dopant in the In site; however, its incorporation by implantation was difficult to control; experiments using P co-implants were inconsistent. The lattice position of inactive C in GaAs in implanted and epitaxial layers is discussed; evidence for formation of C precipitates in GaAs and InP was found. Correlation of the results with literature on C doping in III-V semiconductors led to a phenomenological description of C in III-V compounds (particularly GaAs): The behavior of C is controlled by the chemical nature of C and the instrinsic Fermi level stabilization energy of the material.

  19. Plasma deposition of amorphous hydrogenated carbon films on III-V semiconductors

    NASA Technical Reports Server (NTRS)

    Pouch, John J.; Warner, Joseph D.; Liu, David C.; Alterovitz, Samuel A.

    1988-01-01

    Amorphous hydrogenated carbon films were grown on GaAs, InP and fused silica substrates using plasmas generated from hydrocarbon gases. Methane and n-butane sources were utilized. The effects of flow rate and power density on film growth were investigated. Carbon was the major constituent in the films. The degree of asymmetry at the carbon-semiconductor interface was approximately independent of the power density. Different H-C bonding configurations were detected by the technique of secondary-ion mass spectrometry. Band gaps up to 3 eV were obtained from optical absorption studies. Breakdown strengths as high as 600 MV/m were measured.

  20. Surface passivation of heavily boron or phosphorus doped crystalline silicon utilizing amorphous silicon

    NASA Astrophysics Data System (ADS)

    Carstens, K.; Dahlinger, M.

    2016-05-01

    Excellent surface passivation of heavily boron or phosphorus doped crystalline silicon is presented utilizing undoped hydrogenated amorphous silicon (a-Si:H). For passivating boron doped crystalline silicon surfaces, amorphous silicon needs to be deposited at low temperatures 150°C ≤Tdep≤200°C , leading to a high bandgap. In contrast, low bandgap amorphous silicon causes an inferior surface passivation of highly boron doped crystalline silicon. Boron doping in crystalline silicon leads to a shift of the Fermi energy towards the valence band maximum in the undoped a-Si:H. A simulation, implementing dangling bond defects according to the defect pool model, shows this shift in the undoped a-Si:H passivation to be more pronounced if the a-Si:H has a lower bandgap. Hence, the inferior passivation of boron doped surfaces with low bandgap amorphous silicon stems from a lower silicon-hydrogen bond energy due to this shift of the Fermi energy. Hydrogen effusion and ellipsometry measurements support our interpretation.

  1. Coating of calcia-doped ceria with amorphous silica shell by seeded polymerization technique

    SciTech Connect

    El-Toni, Ahmed Mohamed . E-mail: el-toni@mail.tagen.tohoku.ac.jp; Yin, Shu; Yabe, Shinryo; Sato, Tsugio

    2005-07-12

    Calcia-doped ceria is of potential interest as an ultraviolet (UV) radiation blocking material in personal care products. However, its high catalytic ability for oxidation of organic materials makes it difficult to use as a sunscreen material. Therefore, calcia-doped ceria was coated with amorphous silica by means of seeded polymerization technique in order to depress its oxidation catalytic ability. The catalytic ability as well as UV-shielding ability was investigated for coated particles.

  2. Ion implantation induced defect formation and amorphization in the Group IV semiconductors: Diamond, silicon and germanium

    NASA Astrophysics Data System (ADS)

    Hickey, Diane P.

    Silicon, which has been the workhorse of the semiconductor industry for the past several decades, is now being enhanced with other Group IV elements, such as carbon (silicon carbide) and germanium (silicon-germanium strained channels in transistors), to accentuate properties of silicon for various nanoelectronic devices. However, there is little understanding of the relationship between ion implantation and defect evolution in two of the three corners of the Group IV phase diagram. In particular, the rod-like {311} defect is theorized to be unique to the diamond crystal structure elements. Due to its ability to affect dopant diffusion, the {311} defect is well studied in silicon. However, few studies of germanium and none of diamond have analyzed extended defect formation and evolution using transmission electron spectroscopy. Using ion implantation to induce amorphization is a technological process step in Si devices and potentially for diamond nano-electronics. Defects associated with crystal regrowth in Ge and diamond are not well known. My research studies the formation conditions of extended defects and amorphization in carbon and germanium after ion implantation. Ion implantation damage in diamond-cubic single-crystal silicon, germanium and diamond was produced by Si+ implantation at 1 MeV to a dose of 1 x 1014 cm-2 and 1 x 10 15 cm-2. Damage in Si and Ge was produced by Si + implantation at 40 keV to a dose of 1 x 1014 cm-2 and 1 x 1015 cm-2, and amorphizing damage in diamond was produced by Si+ implantation at 1 MeV to a dose of 3 and 7 x 1015 cm-2. All implants were carried out at room temperature. For non-amorphizing implants (1014 Si+ cm-2) into Ge, dot-like defects formed immediately upon implantation and were stable up to temperatures of 650°C. The activation energy of these defects was determined to be approximately 0.2 +/- 0.1 eV. For amorphizing implants (1015 Si+ cm-2) into Ge and upon solid-phase epitaxial regrowth, the same types of defects seen

  3. Compositions of doped, co-doped and tri-doped semiconductor materials

    DOEpatents

    Lynn, Kelvin; Jones, Kelly; Ciampi, Guido

    2011-12-06

    Semiconductor materials suitable for being used in radiation detectors are disclosed. A particular example of the semiconductor materials includes tellurium, cadmium, and zinc. Tellurium is in molar excess of cadmium and zinc. The example also includes aluminum having a concentration of about 10 to about 20,000 atomic parts per billion and erbium having a concentration of at least 10,000 atomic parts per billion.

  4. Amorphous silicon Schottky barrier solar cells incorporating a thin insulating layer and a thin doped layer

    DOEpatents

    Carlson, David E.

    1980-01-01

    Amorphous silicon Schottky barrier solar cells which incorporate a thin insulating layer and a thin doped layer adjacent to the junction forming metal layer exhibit increased open circuit voltages compared to standard rectifying junction metal devices, i.e., Schottky barrier devices, and rectifying junction metal insulating silicon devices, i.e., MIS devices.

  5. Structural evolution and electronic properties of n-type doped hydrogenated amorphous silicon thin films

    NASA Astrophysics Data System (ADS)

    He, Jian; Li, Wei; Xu, Rui; Qi, Kang-Cheng; Jiang, Ya-Dong

    2011-12-01

    The relationship between structure and electronic properties of n-type doped hydrogenated amorphous silicon (a-Si:H) thin films was investigated. Samples with different features were prepared by plasma enhanced chemical vapor deposition (PECVD) at various substrate temperatures. Raman spectroscopy and Fourier transform infrared (FTIR) spectroscopy were used to evaluate the structural evolution, meanwhile, electronic-spin resonance (ESR) and optical measurement were applied to explore the electronic properties of P-doped a-Si:H thin films. Results reveal that the changes in materials structure affect directly the electronic properties and the doping efficiency of dopant.

  6. Controlling the stoichiometry and doping of semiconductor materials

    DOEpatents

    Albin, David; Burst, James; Metzger, Wyatt; Duenow, Joel; Farrell, Stuart; Colegrove, Eric

    2016-08-16

    Methods for treating a semiconductor material are provided. According to an aspect of the invention, the method includes annealing the semiconductor material in the presence of a compound that includes a first element and a second element. The first element provides an overpressure to achieve a desired stoichiometry of the semiconductor material, and the second element provides a dopant to the semiconductor material.

  7. Tellurium doping effect in avalanche-mode amorphous selenium photoconductive film

    NASA Astrophysics Data System (ADS)

    Park, Wug-Dong; Tanioka, Kenkichi

    2014-11-01

    Amorphous selenium (a-Se) high-gain avalanche rushing amorphous photoconductor (HARP) film has been used for highly sensitive imaging devices. To improve the spectral response of a-Se HARP photoconductive film at a long wavelength, the tellurium (Te) doping effect in an 8-μm-thick a-Se HARP film was investigated. The thickness of the Te-doped a-Se layer in the 8-μm-thick a-Se HARP films was varied from 60 to 120 nm. The signal current increases significantly due to the avalanche multiplication when the target voltage is increased over the threshold voltage. In the 8-μm-thick a-Se HARP film with a Te-doped layer, the spectral response at a long wavelength was improved in comparison with the a-Se HARP film without a Te-doped layer. In addition, the increase of the lag in the 8-μm-thick a-Se HARP target with a Te-doped layer of 120 nm is caused by the photoconductive lag due to the electrons trapped in the Te-doped layer. Based on the current-voltage characteristics, spectral response, and lag characteristics of the 8-μm-thick a-Se HARP targets, the Te-doped layer thickness of 90 nm is suitable for the 8-μm-thick a-Se HARP film.

  8. Silicon and aluminum doping effects on the microstructure and properties of polymeric amorphous carbon films

    NASA Astrophysics Data System (ADS)

    Liu, Xiaoqiang; Hao, Junying; Xie, Yuntao

    2016-08-01

    Polymeric amorphous carbon films were prepared by radio frequency (R.F. 13.56 MHz) magnetron sputtering deposition. The microstructure evolution of the deposited polymeric films induced by silicon (Si) and aluminum(Al) doping were scrutinized through infrared spectroscopy, multi-wavelength Raman spectroscopy, scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The comparative results show that Si doping can enhance polymerization and Al doping results in an increase in the ordered carbon clusters. Si and Al co-doping into polymeric films leads to the formation of an unusual dual nanostructure consisting of cross-linked polymer-like hydrocarbon chains and fullerene-like carbon clusters. The super-high elasticity and super-low friction coefficients (<0.002) under a high vacuum were obtained through Si and Al co-doping into the films. Unconventionally, the co-doped polymeric films exhibited a superior wear resistance even though they were very soft. The relationship between the microstructure and properties of the polymeric amorphous carbon films with different elements doping are also discussed in detail.

  9. Tellurium doping effect in avalanche-mode amorphous selenium photoconductive film

    SciTech Connect

    Park, Wug-Dong; Tanioka, Kenkichi

    2014-11-10

    Amorphous selenium (a-Se) high-gain avalanche rushing amorphous photoconductor (HARP) film has been used for highly sensitive imaging devices. To improve the spectral response of a-Se HARP photoconductive film at a long wavelength, the tellurium (Te) doping effect in an 8-μm-thick a-Se HARP film was investigated. The thickness of the Te-doped a-Se layer in the 8-μm-thick a-Se HARP films was varied from 60 to 120 nm. The signal current increases significantly due to the avalanche multiplication when the target voltage is increased over the threshold voltage. In the 8-μm-thick a-Se HARP film with a Te-doped layer, the spectral response at a long wavelength was improved in comparison with the a-Se HARP film without a Te-doped layer. In addition, the increase of the lag in the 8-μm-thick a-Se HARP target with a Te-doped layer of 120 nm is caused by the photoconductive lag due to the electrons trapped in the Te-doped layer. Based on the current-voltage characteristics, spectral response, and lag characteristics of the 8-μm-thick a-Se HARP targets, the Te-doped layer thickness of 90 nm is suitable for the 8-μm-thick a-Se HARP film.

  10. Optical Nonlinearities in Semiconductor Doped Glass Channel Waveguides.

    NASA Astrophysics Data System (ADS)

    Banyai, William Charles

    The nonlinear optical properties of a semiconductor -doped glass (SDG) channel waveguide were measured on a picosecond time-scale; namely, fluence-dependent changes in the absorption and the refractive index as well as the relaxation time of the nonlinearity. Slower, thermally -induced changes in the refractive index were also observed. The saturation of the changes in the absorption and the refractive index with increasing optical fluence is explained using a plasma model with bandfilling as the dominant mechanism. The fast relaxation time of the excited electron-hole plasma (20 ps) is explained using a surface-state recombination model. A figure of merit for a nonlinear directional coupler fabricated in a material with a saturable nonlinear refractive index is presented. The measured nonlinear change in the refractive index of the SDG saturates below the value required to effect fluence-dependent switching in a nonlinear directional coupler. Experiments with a channel-waveguide directional coupler support this prediction. However, absorption switching due to differential saturation of the absorption in the two arms of the directional coupler was observed.

  11. Lag and light-transfer characteristics of amorphous selenium photoconductive film with tellurium-doped layer

    NASA Astrophysics Data System (ADS)

    Park, Wug-Dong; Tanioka, Kenkichi

    2016-07-01

    Amorphous selenium (a-Se) high-gain avalanche rushing amorphous photoconductor (HARP) films have been used for highly sensitive imaging devices. To study a-Se HARP films for a solid-state image sensor, current–voltage, lag, spectral response, and light-transfer characteristics of 0.4-µm-thick a-Se HARP films are investigated. Also, to clarify a suitable Te-doped a-Se layer thickness in the a-Se photoconductor, we considered the effects of Te-doped layer thickness on the lag, spectral response, and light-transfer characteristics of 0.4-µm-thick a-Se HARP films. The threshold field, at which avalanche multiplication occurs in the a-Se HARP targets, decreases when the Te-doped layer thickness increases. The lag of 0.4-µm-thick a-Se HARP targets with Te-doped layers is higher than that of the target without Te doping. The lag of the targets with Te-doped layers is caused by the electrons trapped in the Te-doped layers within the 0.4-µm-thick a-Se HARP films. From the results of the spectral response measurement of about 15 min, the 0.4-µm-thick a-Se HARP targets with Te-doped layers of 90 and 120 nm are observed to be unstable owing to the electrons trapped in the Te-doped a-Se layer. From the light-transfer characteristics of 0.4-µm-thick a-Se HARP targets, as the slope at the operating point of signal current–voltage characteristics in the avalanche mode increases, the γ of the a-Se HARP targets decreases. Considering the effects of dark current on the lag and spectral response characteristics, a Te-doped layer of 60 nm is suitable for 0.4-µm-thick a-Se HARP films.

  12. Catalytic doping of phosphorus and boron atoms on hydrogenated amorphous silicon films

    NASA Astrophysics Data System (ADS)

    Seto, Junichi; Ohdaira, Keisuke; Matsumura, Hideki

    2016-04-01

    We investigate the low-temperature doping of phosphorus (P) and boron (B) atoms on hydrogenated amorphous silicon (a-Si:H) films by catalytic doping (Cat-doping). The conductivity of a-Si:H films increases as catalyzer temperature (T cat) increases, and the increase in conductivity is accompanied by a significant reduction in activation energy obtained from the Arrhenius plot of the conductivity. Secondary ion mass spectrometry (SIMS) measurement reveals that Cat-doped P and B atoms exist within ˜10-15 nm from the a-Si:H film surface, indicating that the shallow doping of P and B atoms is realized on a-Si:H films similarly to the case of Cat-doping on crystalline Si (c-Si) wafers. We also confirm no additional film deposition during Cat-doping. These results suggest that decomposed species are effectively doped on a-Si:H films similarly to the case of Cat-doping on c-Si.

  13. Erbium-doped amorphous silicon nitride light emitters for on-chip photonics applications

    NASA Astrophysics Data System (ADS)

    Yerci, Selcuk

    Silicon Photonics is considered as a viable, scalable and cost-effective solution to "the interconnect bottleneck" problem. However, the engineering of complementary metal oxide semiconductor (CMOS) compatible light sources is considered the biggest challenge of silicon photonics. Er-doped silicon-based structures are very promising candidates for 1.54 pm operation. Although Er-doped fiber lasers and amplifiers are available for long-haul communications, the small emission cross section of Er severely limits the applicability to small footprint (˜2.5 cm2) optical chip applications due to the small gain x length product. As a result, engineering strategies to boost emission efficiency and optical gain under both optical and electrical pumping in Er-doped CMOS materials need to be developed. Recently, energy sensitization of Er ions through Si-nanocrystals in Si-rich SiO2 films (Er:SRO) has been demonstrated with excitation cross sections (sigmaexc) of Er ions four-five orders of magnitude larger than sigmaabs. However, this approach suffers from the substantial free carrier losses introduced by Si-nanocrystals and the low fraction of optically active Er ions preventing net optical gain. Hence, novel materials approaches need to be developed. In this thesis, Er-doped amorphous silicon nitride (Er:SiNx) by N2 reactive sputtering is developed as a CMOS compatible platform for light sources operating under both optical and electrical pumping. The origin of visible PL of SiNx is explained by radiative transitions via localized states at the band-tails of SiNx. The efficient energy transfer between the localized band tails states in SiNx and Er ions is discussed and, sigmaexc is quantified. By performing temperature dependent studies, we demonstrated that the energy transfer is phonon-mediated. Er PL intensity and lifetime are optimized in ErSiN x by varying the fabrication parameters and a fundamental trade-off between Er excitation and emission efficiencies is

  14. Electrochemical lithium doping of a pentacene molecule semiconductor

    NASA Astrophysics Data System (ADS)

    Fang, Baizeng; Zhou, Haoshen; Honma, Itaru

    2005-06-01

    Li-doped pentacene has been developed by using an electrochemical approach; that is, constant-potential electrolysis. Li-doped pentacene was characterized by Raman spectrometry and x-ray diffraction measurements. Lithium doping introduces a modification of the C-H vibrational modes located at the end of pentacene molecules. A low doping level has been observed for electrochemical synthesis of Li-doped pentacene, and lithium species are supposed to be intercalated between the two-dimensional pentacene layers. The lithium-doped pentacene exhibits a conductivity of ˜6×10-3Scm-1.

  15. Direct growth of single-crystalline III-V semiconductors on amorphous substrates

    NASA Astrophysics Data System (ADS)

    Chen, Kevin; Kapadia, Rehan; Harker, Audrey; Desai, Sujay; Seuk Kang, Jeong; Chuang, Steven; Tosun, Mahmut; Sutter-Fella, Carolin M.; Tsang, Michael; Zeng, Yuping; Kiriya, Daisuke; Hazra, Jubin; Madhvapathy, Surabhi Rao; Hettick, Mark; Chen, Yu-Ze; Mastandrea, James; Amani, Matin; Cabrini, Stefano; Chueh, Yu-Lun; Ager, Joel W., III; Chrzan, Daryl C.; Javey, Ali

    2016-01-01

    The III-V compound semiconductors exhibit superb electronic and optoelectronic properties. Traditionally, closely lattice-matched epitaxial substrates have been required for the growth of high-quality single-crystal III-V thin films and patterned microstructures. To remove this materials constraint, here we introduce a growth mode that enables direct writing of single-crystalline III-V's on amorphous substrates, thus further expanding their utility for various applications. The process utilizes templated liquid-phase crystal growth that results in user-tunable, patterned micro and nanostructures of single-crystalline III-V's of up to tens of micrometres in lateral dimensions. InP is chosen as a model material system owing to its technological importance. The patterned InP single crystals are configured as high-performance transistors and photodetectors directly on amorphous SiO2 growth substrates, with performance matching state-of-the-art epitaxially grown devices. The work presents an important advance towards universal integration of III-V's on application-specific substrates by direct growth.

  16. Electronic structure of intrinsic defects in non-stoichiometric amorphous In-Ga-Zn-O semiconductors

    NASA Astrophysics Data System (ADS)

    Han, Woo Hyun; Chang, Kee Joo

    Amorphous oxide semiconductors, such as amorphous In-Ga-Zn-O (a-IGZO), have attracted much attention because of their use as a channel material in thin-film transistors (TFTs). Despite many advantages such as flexibility, transparency, and high electron mobility, a-IGZO based TFTs suffer from defects which cause the instability of threshold voltage under negative bias illumination stress (NBIS) as well as positive bias stress (PBS). Recently, we have proposed that O-vacancy and O-interstitial defects are responsible for the NBIS and PBS instabilities, respectively. In the previous studies, O-related defects were intentionally introduced in stoichiometric a-IGZO. Since the composition ratio is likely to be deviated from the ideal stoichiometry during fabrication, it is important to understand the electronic structure of non-stoichiometric a-IGZO. Here we perform density functional calculations to investigate the electronic structure of O-related defects in various a-IGZO systems with non-stoichiometric chemical compositions, which are generated through melt-and-quench molecular dynamics simulations. We consder both O-abundant and O-deficient samples and discuss the role of intrinsic defects in the device instability.

  17. Direct growth of single-crystalline III–V semiconductors on amorphous substrates

    DOE PAGESBeta

    Chen, Kevin; Kapadia, Rehan; Harker, Audrey; Desai, Sujay; Seuk Kang, Jeong; Chuang, Steven; Tosun, Mahmut; Sutter-Fella, Carolin M.; Tsang, Michael; Zeng, Yuping; et al

    2016-01-27

    The III–V compound semiconductors exhibit superb electronic and optoelectronic properties. Traditionally, closely lattice-matched epitaxial substrates have been required for the growth of high-quality single-crystal III–V thin films and patterned microstructures. To remove this materials constraint, here we introduce a growth mode that enables direct writing of single-crystalline III–V’s on amorphous substrates, thus further expanding their utility for various applications. The process utilizes templated liquid-phase crystal growth that results in user-tunable, patterned micro and nanostructures of single-crystalline III–V’s of up to tens of micrometres in lateral dimensions. InP is chosen as a model material system owing to its technological importance. Themore » patterned InP single crystals are configured as high-performance transistors and photodetectors directly on amorphous SiO2 growth substrates, with performance matching state-of-the-art epitaxially grown devices. In conclusion, the work presents an important advance towards universal integration of III–V’s on application-specific substrates by direct growth.« less

  18. Structure and electronic properties features of amorphous chalhogenide semiconductor films prepared by ion-plasma spraying

    SciTech Connect

    Korobova, N. Timoshenkov, S.; Almasov, N.; Prikhodko, O.; Tsendin, K.

    2014-10-21

    Structure of amorphous chalcogenide semiconductor glassy As-S-Se films, obtained by high-frequency (HF) ion-plasma sputtering has been investigated. It was shown that the length of the atomic structure medium order and local structure were different from the films obtained by thermal vacuum evaporation. Temperature dependence of dark conductivity, as well as the dependence of the spectral transmittance has been studied. Conductivity value was determined at room temperature. Energy activation conductivity and films optical band gap have been calculated. Temperature and field dependence of the drift mobility of charge carriers in the HF As-S-Se films have been shown. Bipolarity of charge carriers drift mobility has been confirmed. Absence of deep traps for electrons in the As{sub 40}Se{sub 30}S{sub 30} spectrum of localized states for films obtained by HF plasma ion sputtering was determined. Bipolar drift of charge carriers was found in amorphous As{sub 40}Se{sub 30}S{sub 30} films obtained by ion-plasma sputtering of high-frequency, unlike the films of these materials obtained by thermal evaporation.

  19. Direct growth of single-crystalline III–V semiconductors on amorphous substrates

    PubMed Central

    Chen, Kevin; Kapadia, Rehan; Harker, Audrey; Desai, Sujay; Seuk Kang, Jeong; Chuang, Steven; Tosun, Mahmut; Sutter-Fella, Carolin M.; Tsang, Michael; Zeng, Yuping; Kiriya, Daisuke; Hazra, Jubin; Madhvapathy, Surabhi Rao; Hettick, Mark; Chen, Yu-Ze; Mastandrea, James; Amani, Matin; Cabrini, Stefano; Chueh, Yu-Lun; Ager III, Joel W.; Chrzan, Daryl C.; Javey, Ali

    2016-01-01

    The III–V compound semiconductors exhibit superb electronic and optoelectronic properties. Traditionally, closely lattice-matched epitaxial substrates have been required for the growth of high-quality single-crystal III–V thin films and patterned microstructures. To remove this materials constraint, here we introduce a growth mode that enables direct writing of single-crystalline III–V's on amorphous substrates, thus further expanding their utility for various applications. The process utilizes templated liquid-phase crystal growth that results in user-tunable, patterned micro and nanostructures of single-crystalline III–V's of up to tens of micrometres in lateral dimensions. InP is chosen as a model material system owing to its technological importance. The patterned InP single crystals are configured as high-performance transistors and photodetectors directly on amorphous SiO2 growth substrates, with performance matching state-of-the-art epitaxially grown devices. The work presents an important advance towards universal integration of III–V's on application-specific substrates by direct growth. PMID:26813257

  20. Direct growth of single-crystalline III-V semiconductors on amorphous substrates.

    PubMed

    Chen, Kevin; Kapadia, Rehan; Harker, Audrey; Desai, Sujay; Seuk Kang, Jeong; Chuang, Steven; Tosun, Mahmut; Sutter-Fella, Carolin M; Tsang, Michael; Zeng, Yuping; Kiriya, Daisuke; Hazra, Jubin; Madhvapathy, Surabhi Rao; Hettick, Mark; Chen, Yu-Ze; Mastandrea, James; Amani, Matin; Cabrini, Stefano; Chueh, Yu-Lun; Ager Iii, Joel W; Chrzan, Daryl C; Javey, Ali

    2016-01-01

    The III-V compound semiconductors exhibit superb electronic and optoelectronic properties. Traditionally, closely lattice-matched epitaxial substrates have been required for the growth of high-quality single-crystal III-V thin films and patterned microstructures. To remove this materials constraint, here we introduce a growth mode that enables direct writing of single-crystalline III-V's on amorphous substrates, thus further expanding their utility for various applications. The process utilizes templated liquid-phase crystal growth that results in user-tunable, patterned micro and nanostructures of single-crystalline III-V's of up to tens of micrometres in lateral dimensions. InP is chosen as a model material system owing to its technological importance. The patterned InP single crystals are configured as high-performance transistors and photodetectors directly on amorphous SiO2 growth substrates, with performance matching state-of-the-art epitaxially grown devices. The work presents an important advance towards universal integration of III-V's on application-specific substrates by direct growth. PMID:26813257

  1. Electroless chemical grafting of nitrophenyl groups on n-doped hydrogenated amorphous silicon surfaces.

    PubMed

    Kim, Chulki; Oh, Kiwon; Han, Seunghee; Kim, Kyungkon; Kim, Il Won; Kim, Heesuk

    2014-08-01

    The direct spontaneous grafting of 4-nitrophenyl molecules onto n-doped hydrogenated amorphous silicon (a-Si:H) surfaces without external ultraviolet, thermal, or electrochemical energy was invegtigated. Clean n-doped a-Si:H thin films were dipped in a solution of 4-nitrobenzenediazonium salts (PNBD) in acetonitrile. After the modified surfaces were rinsed, they were analyzed qualitatively and quantitatively by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). XPS and AFM results show that the reaction of an n-doped a-Si:H thin film with PNBD self-terminates without polymerization, after 5 h, and the surface number density of 4-nitrophenyl molecules is 4.2 x 10(15)/cm2. These results demonstrate that the spontaneous grafting of nitrophenyl layers onto n-doped a-Si:H thin films is an attractive pathway toward forming interfaces between a-Si:H and organic layers under ambient conditions. PMID:25936109

  2. High mobility amorphous zinc oxynitride semiconductor material for thin film transistors

    SciTech Connect

    Ye Yan; Lim, Rodney; White, John M.

    2009-10-01

    Zinc oxynitride semiconductor material is produced through a reactive sputtering process in which competition between reactions responsible for the growth of hexagonal zinc oxide (ZnO) and for the growth of cubic zinc nitride (Zn{sub 3}N{sub 2}) is promoted. In contrast to processes in which the reaction for either the oxide or the nitride is dominant, the multireaction process yields a substantially amorphous or a highly disordered nanocrystalline film with higher Hall mobility, 47 cm{sup 2} V{sup -1} s{sup -1} for the as-deposited film produced at 50 deg. C and 110 cm{sup 2} V{sup -1} s{sup -1} after annealing at 400 deg. C. In addition, it has been observed that the Hall mobility of the material increases as the carrier concentration decreases in a carrier concentration range where a multicomponent metal oxide semiconductor, indium-gallium-zinc oxide, follows the opposite trend. This indicates that the carrier transports in the single-metal compound and the multimetal compound are probably dominated by different mechanisms. Film stability and thin film transistor performance of the material have also been tested, and results are presented herein.

  3. Ferroelectric switching of poly(vinylidene difluoride-trifluoroethylene) in metal-ferroelectric-semiconductor non-volatile memories with an amorphous oxide semiconductor

    NASA Astrophysics Data System (ADS)

    Gelinck, G. H.; van Breemen, A. J. J. M.; Cobb, B.

    2015-03-01

    Ferroelectric polarization switching of poly(vinylidene difluoride-trifluoroethylene) is investigated in different thin-film device structures, ranging from simple capacitors to dual-gate thin-film transistors (TFT). Indium gallium zinc oxide, a high mobility amorphous oxide material, is used as semiconductor. We find that the ferroelectric can be polarized in both directions in the metal-ferroelectric-semiconductor (MFS) structure and in the dual-gate TFT under certain biasing conditions, but not in the single-gate thin-film transistors. These results disprove the common belief that MFS structures serve as a good model system for ferroelectric polarization switching in thin-film transistors.

  4. Ferroelectric switching of poly(vinylidene difluoride-trifluoroethylene) in metal-ferroelectric-semiconductor non-volatile memories with an amorphous oxide semiconductor

    SciTech Connect

    Gelinck, G. H.; Breemen, A. J. J. M. van; Cobb, B.

    2015-03-02

    Ferroelectric polarization switching of poly(vinylidene difluoride-trifluoroethylene) is investigated in different thin-film device structures, ranging from simple capacitors to dual-gate thin-film transistors (TFT). Indium gallium zinc oxide, a high mobility amorphous oxide material, is used as semiconductor. We find that the ferroelectric can be polarized in both directions in the metal-ferroelectric-semiconductor (MFS) structure and in the dual-gate TFT under certain biasing conditions, but not in the single-gate thin-film transistors. These results disprove the common belief that MFS structures serve as a good model system for ferroelectric polarization switching in thin-film transistors.

  5. Study on the photoresponse of amorphous In-Ga-Zn-O and zinc oxynitride semiconductor devices by the extraction of sub-gap-state distribution and device simulation.

    PubMed

    Jang, Jun Tae; Park, Jozeph; Ahn, Byung Du; Kim, Dong Myong; Choi, Sung-Jin; Kim, Hyun-Suk; Kim, Dae Hwan

    2015-07-22

    Persistent photoconduction (PPC) is a phenomenon that limits the application of oxide semiconductor thin-film transistors (TFTs) in optical sensor-embedded displays. In the present work, a study on zinc oxynitride (ZnON) semiconductor TFTs based on the combination of experimental results and device simulation is presented. Devices incorporating ZnON semiconductors exhibit negligible PPC effects compared with amorphous In-Ga-Zn-O (a-IGZO) TFTs, and the difference between the two types of materials are examined by monochromatic photonic C-V spectroscopy (MPCVS). The latter method allows the estimation of the density of subgap states in the semiconductor, which may account for the different behavior of ZnON and IGZO materials with respect to illumination and the associated PPC. In the case of a-IGZO TFTs, the oxygen flow rate during the sputter deposition of a-IGZO is found to influence the amount of PPC. Small oxygen flow rates result in pronounced PPC, and large densities of valence band tail (VBT) states are observed in the corresponding devices. This implies a dependence of PPC on the amount of oxygen vacancies (VO). On the other hand, ZnON has a smaller bandgap than a-IGZO and contains a smaller density of VBT states over the entire range of its bandgap energy. Here, the concept of activation energy window (AEW) is introduced to explain the occurrence of PPC effects by photoinduced electron doping, which is likely to be associated with the formation of peroxides in the semiconductor. The analytical methodology presented in this report accounts well for the reduction of PPC in ZnON TFTs, and provides a quantitative tool for the systematic development of phototransistors for optical sensor-embedded interactive displays. PMID:26094854

  6. Tin-Doped Inorganic Amorphous Films for Use as Transparent Monolithic Phosphors.

    PubMed

    Masai, Hirokazu; Miyata, Hiroki; Yamada, Yasuhiro; Okumura, Shun; Yanagida, Takayuki; Kanemitsu, Yoshihiko

    2015-01-01

    Although inorganic crystalline phosphors can exhibit high quantum efficiency, their use in phosphor films has been limited by a reliance on organic binders that have poor durability when exposed to high-power and/or high excitation energy light sources. To address this problem, Sn(2+)-doped transparent phosphate films measuring several micrometers in thickness have been successfully prepared through heat treatment and a subsequent single dip-coating process. The resulting monolithic inorganic amorphous film exhibited an internal quantum efficiency of over 60% and can potentially utilize transmitted light. Analysis of the film's emissivity revealed that its color can be tuned by changing the amount of Mn and Sn added to influence the energy transfer from Sn(2+) to Mn(2+). It is therefore concluded that amorphous films containing such emission centers can provide a novel and viable alternative to conventional amorphous films containing crystalline phosphors in light-emitting devices. PMID:26061744

  7. Tin-Doped Inorganic Amorphous Films for Use as Transparent Monolithic Phosphors

    PubMed Central

    Masai, Hirokazu; Miyata, Hiroki; Yamada, Yasuhiro; Okumura, Shun; Yanagida, Takayuki; Kanemitsu, Yoshihiko

    2015-01-01

    Although inorganic crystalline phosphors can exhibit high quantum efficiency, their use in phosphor films has been limited by a reliance on organic binders that have poor durability when exposed to high-power and/or high excitation energy light sources. To address this problem, Sn2+ -doped transparent phosphate films measuring several micrometers in thickness have been successfully prepared through heat treatment and a subsequent single dip-coating process. The resulting monolithic inorganic amorphous film exhibited an internal quantum efficiency of over 60% and can potentially utilize transmitted light. Analysis of the film’s emissivity revealed that its color can be tuned by changing the amount of Mn and Sn added to influence the energy transfer from Sn2+ to Mn2+. It is therefore concluded that amorphous films containing such emission centers can provide a novel and viable alternative to conventional amorphous films containing crystalline phosphors in light-emitting devices. PMID:26061744

  8. Structural analysis of a completely amorphous {sup 238}Pu-doped zircon by neutron diffraction.

    SciTech Connect

    Fortner, J. A.; Badyal, Y.; Price, D. C.; Hanchar, J. M.; Weber, W. J.; Materials Science Division; PNNL

    1999-01-01

    The structure of a completely amorphous zircon was determined by time-of-flight neutron diffraction at Argonne's Intense Pulsed Neutron Source (IPNS). The sample of metamict zircon (ZrSiO{sub 4}), initially doped to 8.85 weight percent {sup 238}Pu, had been completely amorphized by alpha-recoil damage since its synthesis in 1981 at the Pacific Northwest National Laboratory (PNNL). The measured diffraction structure factor, S(Q), indicated a completely amorphous sample, with no signs of residual zircon microcrystallinity. The pair distribution function obtained indicated that the structure was that of an oxide glass, retaining the Si-0, Zr-0, and O-O bond lengths of crystalline zircon.

  9. Structural analysis of a completely amorphous {sup 238}Pu-doped zircon by neutron diffraction.

    SciTech Connect

    Fortner, J. A.

    1998-12-16

    The structure of a completely amorphous zircon was determined by time-of-flight neutron diffraction at Argonne's Intense Pulsed Neutron Source (IPNS). The sample of metamict zircon (ZrSiO{sub 4}),initially doped to 8.85 weight percent {sup 238}Pi, had been completely amorphized by alpha-recoil damage since its synthesis in 1981 at the Pacific Northwest National Laboratory (PNNL). The measured diffraction structure factor, S(Q), indicated a completely amorphous sample, with no signs of residual zircon microcrystallinity. The pair distribution function obtained indicated that the structure was that of an oxide glass, retaining the Si-0, Zr-0, and O-O bond lengths of crystalline zircon.

  10. Photoconductivity studies on amorphous and crystalline TiO2 films doped with gold nanoparticles

    NASA Astrophysics Data System (ADS)

    Valverde-Aguilar, G.; García-Macedo, J. A.; Rentería-Tapia, V.; Aguilar-Franco, M.

    2011-06-01

    In this work, amorphous and crystalline TiO2 films were synthesized by the sol-gel process at room temperature. The TiO2 films were doped with gold nanoparticles. The films were spin-coated on glass wafers. The crystalline samples were annealed at 100°C for 30 minutes and sintered at 520°C for 2 h. All films were characterized using X-ray diffraction, transmission electronic microscopy and UV-Vis absorption spectroscopy. Two crystalline phases, anatase and rutile, were formed in the matrix TiO2 and TiO2/Au. An absorption peak was located at 570 nm (amorphous) and 645 nm (anatase). Photoconductivity studies were performed on these films. The experimental data were fitted with straight lines at darkness and under illumination at 515 nm and 645 nm. This indicates an ohmic behavior. Crystalline TiO2/Au films are more photoconductive than the amorphous ones.

  11. Local order origin of thermal stability enhancement in amorphous Ag doping GeTe

    SciTech Connect

    Xu, L.; Li, Y.; Yu, N. N.; Zhong, Y. P.; Miao, X. S.

    2015-01-19

    We demonstrate the impacts of Ag doping on the local atomic structure of amorphous GeTe phase-change material. The variations of phonon vibrational modes, boding nature, and atomic structure are shown by Raman, X-ray photoelectron spectroscopy, and ab initio calculation. Combining the experiments and simulations, we observe that the number of Ge atoms in octahedral site decreases and that in tetrahedral site increases. This modification in local order of GeTe originating from the low valence element will affect the crystallization behavior of amorphous GeTe, which is verified by differential scanning calorimetry and transmission electron microscope results. This work not only gives the analysis on the structural change of GeTe with Ag dopants but also provides a method to enhance the thermal stability of amorphous phase-change materials for memory and brain-inspired computing applications.

  12. Laser induced melting and crystallization of boron doped amorphous silicon

    SciTech Connect

    Nebel, C.E.; Schoeniger, S.; Dahlheimer, B.; Stutzmann, M.

    1997-07-01

    Transient reflectivity experiments have been performed to measure the dynamics of laser-induced melting of amorphous silicon (a-Si) and the crystallization to {micro}c-Si of films with different thicknesses on Corning 7059 glass. The laser-induced melting takes place with a velocity of 13 to 24 m/s, while the solidification is about a factor 10 slower. The crystallization starts at the Si/glass interface and at the surface. In the center of the films Si remains liquid for an extended period of time. The crystallization dynamics point towards an heterogeneous morphology of laser-crystallized Si, where the surface and the interface layers are composed of small grains and the bulk of larger grains.

  13. Kelvin probe force microscopy for characterizing doped semiconductors for future sensor applications in nano- and biotechnology

    NASA Astrophysics Data System (ADS)

    Schmidt, Heidemarie; Habicht, Stefan; Feste, Sebastian; Müller, Anne-Dorothea; Schmidt, Oliver G.

    2013-09-01

    Kelvin probe force microscopy (KPFM) is one of the most promising non-contact electrical nanometrology techniques to characterize doped semiconductors. By applying a recently introduced explanation of measured KPFM signals, we show the applicability of KPFM to determine and control surface-near electrostatic forces in planar doped silicon and in doped silicon nanostructures. Surface-near electrostatic forces may be used for the immobilization of nano- and biomaterials in future sensor applications in nano- and biotechnology. Additionally, the influence of the electrostatic potential distribution in doped semiconductor nanostructures, e.g. in horizontal Si nanowires, and its influence on the surface-near electrostatic forces are discussed. It is explained how drift and diffusion of injected electrons and holes in intrinsic electric fields influence the detected KPFM signal. For example KPFM is successfully employed to locate p+p and n+p junctions along B-doped and As-doped p-Si nanowires, respectively. As an outlook the physical immobilization and the transport of biomaterials above arrays of separately addressable doped semiconductor cells will be discussed.

  14. Effect of doping on electronic structure and photocatalytic behavior of amorphous TiO2.

    PubMed

    Ghuman, Kulbir Kaur; Singh, Chandra Veer

    2013-11-27

    Visible light photocatalysts based on doped crystalline forms of titanium dioxide (TiO2) have attracted significant scientific attention in recent decades. Amorphous TiO2, despite many merits over crystalline phases, has not been studied as thoroughly. In this paper, an in-depth analysis of the electronic properties of doped amorphous TiO2 is performed using density functional theory with Hubbard's energy correction (DFT + U). Monodoping with p-type (N) and n-type (Nb) dopants shows appreciable bandgap reduction, but leads to recombination centers due to the presence of uncompensated charges. To resolve this issue, charge compensation via codoping is attempted. The charge compensated codoping not only reduces the bandgap by 0.4 eV but also eliminates the bandgap states present in monodoped systems responsible for charge carrier recombination. Furthermore, the localized tail states present in the aTiO2 system are eliminated to a large extent which leads to a decrease in the charge recombination and an increase in the charge migration. Thus, appropriate doping of amorphous TiO2 may lead to an alternative route for the development of visible light photocatalysts. PMID:24172752

  15. Effect of doping on electronic structure and photocatalytic behavior of amorphous TiO2

    NASA Astrophysics Data System (ADS)

    Ghuman, Kulbir Kaur; Veer Singh, Chandra

    2013-11-01

    Visible light photocatalysts based on doped crystalline forms of titanium dioxide (TiO2) have attracted significant scientific attention in recent decades. Amorphous TiO2, despite many merits over crystalline phases, has not been studied as thoroughly. In this paper, an in-depth analysis of the electronic properties of doped amorphous TiO2 is performed using density functional theory with Hubbard’s energy correction (DFT + U). Monodoping with p-type (N) and n-type (Nb) dopants shows appreciable bandgap reduction, but leads to recombination centers due to the presence of uncompensated charges. To resolve this issue, charge compensation via codoping is attempted. The charge compensated codoping not only reduces the bandgap by 0.4 eV but also eliminates the bandgap states present in monodoped systems responsible for charge carrier recombination. Furthermore, the localized tail states present in the aTiO2 system are eliminated to a large extent which leads to a decrease in the charge recombination and an increase in the charge migration. Thus, appropriate doping of amorphous TiO2 may lead to an alternative route for the development of visible light photocatalysts.

  16. High-temperature ferromagnetism in heavily Fe-doped ferromagnetic semiconductor (Ga,Fe)Sb

    NASA Astrophysics Data System (ADS)

    Tu, Nguyen Thanh; Hai, Pham Nam; Anh, Le Duc; Tanaka, Masaaki

    2016-05-01

    We show high-temperature ferromagnetism in heavily Fe-doped ferromagnetic semiconductor (Ga1-x,Fex)Sb (x = 23% and 25%) thin films grown by low-temperature molecular beam epitaxy. Magnetic circular dichroism spectroscopy and anomalous Hall effect measurements indicate intrinsic ferromagnetism of these samples. The Curie temperature reaches 300 K and 340 K for x = 23% and 25%, respectively, which are the highest values reported so far in intrinsic III-V ferromagnetic semiconductors.

  17. Technique for magnetic susceptibility determination in the highly doped semiconductors by electron spin resonance

    SciTech Connect

    Veinger, A. I.; Zabrodskii, A. G.; Tisnek, T. V.; Goloshchapov, S. I.; Semenikhin, P. V.

    2014-08-20

    A method for determining the magnetic susceptibility in the highly doped semiconductors is considered. It is suitable for the semiconductors near the metal - insulator transition when the conductivity changes very quickly with the temperature and the resonance line form distorts. A procedure that is based on double integration of the positive part of the derivative of the absorption line having a Dyson shape and takes into account the depth of the skin layer is described. Analysis is made for the example of arsenic-doped germanium samples at a rather high concentration corresponding to the insulator-metal phase transition.

  18. Molecular Electrical Doping of Organic Semiconductors: Fundamental Mechanisms and Emerging Dopant Design Rules.

    PubMed

    Salzmann, Ingo; Heimel, Georg; Oehzelt, Martin; Winkler, Stefanie; Koch, Norbert

    2016-03-15

    Today's information society depends on our ability to controllably dope inorganic semiconductors, such as silicon, thereby tuning their electrical properties to application-specific demands. For optoelectronic devices, organic semiconductors, that is, conjugated polymers and molecules, have emerged as superior alternative owing to the ease of tuning their optical gap through chemical variability and their potential for low-cost, large-area processing on flexible substrates. There, the potential of molecular electrical doping for improving the performance of, for example, organic light-emitting devices or organic solar cells has only recently been established. The doping efficiency, however, remains conspicuously low, highlighting the fact that the underlying mechanisms of molecular doping in organic semiconductors are only little understood compared with their inorganic counterparts. Here, we review the broad range of phenomena observed upon molecularly doping organic semiconductors and identify two distinctly different scenarios: the pairwise formation of both organic semiconductor and dopant ions on one hand and the emergence of ground state charge transfer complexes between organic semiconductor and dopant through supramolecular hybridization of their respective frontier molecular orbitals on the other hand. Evidence for the occurrence of these two scenarios is subsequently discussed on the basis of the characteristic and strikingly different signatures of the individual species involved in the respective doping processes in a variety of spectroscopic techniques. The critical importance of a statistical view of doping, rather than a bimolecular picture, is then highlighted by employing numerical simulations, which reveal one of the main differences between inorganic and organic semiconductors to be their respective density of electronic states and the doping induced changes thereof. Engineering the density of states of doped organic semiconductors, the Fermi

  19. Pulsed laser ablation growth and doping of epitaxial compound semiconductor films

    SciTech Connect

    Lowndes, D.H.; Rouleau, C.M.; Geohegan, D.B.; Budai, J.D.; Poker, D.B.; Puretzky, A.A.; Strauss, M.A.; Pedraza, A.J.; Park, J.W.

    1995-12-01

    Pulsed laser ablation (PLA) has several characteristics that are potentially attractive for the growth and doping of chemically complex compound semiconductors including (1) stoichiometric (congruent) transfer of composition from target to film, (2) the use of reactive gases to control film composition and/or doping via energetic-beam-induced reactions, and (3) low-temperature nonequilibrium phase formation in the laser-generated plasma ``plume.`` However, the electrical properties of compound semiconductors are far more sensitive to low concentrations of defects than are the oxide metals/ceramics for which PLA has been so successful. Only recently have doped epitaxial compound semiconductor films been grown by PLA. Fundamental studies are being carried out to relate film electrical and microstructural properties to the energy distribution of ablated species, to the temporal evolution of the ablation pulse in ambient gases, and to beam assisted surface and/or gas-phase reactions. In this paper the authors describe results of ex situ Hall effect, high-resolution x-ray diffraction, transmission electron microscopy, and Rutherford backscattering measurements that are being used in combination with in situ RHEED and time-resolved ion probe measurements to evaluate PLA for growth of doped epitaxial compound semiconductor films and heterostructures. Examples are presented and results analyzed for doped II-VI, I-III-VI, and column-III nitride materials grown recently in this and other laboratories.

  20. Inverted xerographic depletion discharge mechanism for the dark decay of electrostatic surface potential on amorphous semiconductors

    SciTech Connect

    Kasap, S.O.

    1988-07-01

    Recently, the xerographic depletion discharge (XDD) model has been applied extensively to chemically modified a-Se, a-Se/sub 1/..sqrt../sub x/Te/sub x/ alloys, and a-As/sub 2/Se/sub 3/ as well as to a-Si:H films to study the nature of charge carrier generation from deep mobility gap states which control the dark decay of the electrostatic surface potential on a corona charged amorphous semiconductor. In the normal XDD model, the dark discharge involves bulk thermal generation of a mobile carrier of the same sign as the surface charge and its subsequent sweep out from the sample leaving behind an ionized center of opposite charge. It is shown that an ''inverted depletion discharge'' mechanism, which involves the thermal generation of a mobile charge carrier of the opposite sign to the surface charge and its subsequent drift to the surface and the resulting surface charge neutralization there, results in a dark discharge rate which has identical features as the normal XDD mechanism. In the normal XDD mechanism, the neutral region develops after the depletion time from the grounded electrode, whereas in the inverted XDD mechanism the neutral region grows from the surface. Furthermore, during inverted depletion discharge the surface charge is actually dissipated by neutralization, whereas in the normal depletion discharge model there is no such requirement over the time scale of the experiment. It is concluded that xerographic dark decay experiments alone cannot determine the sign of the thermally generated mobile carrier and that of the bulk space charge. Chemically modified amorphous selenium case is discussed as an example of surface potential decay resulting from bulk space-charge buildup.

  1. Controlling ferromagnetism of (In,Fe)As semiconductors by electron doping

    SciTech Connect

    Dang Vu, Nguyen; Fukushima, Tetsuya; Katayama-Yoshida, Hiroshi; Sato, Kazunori

    2014-02-21

    Based on experimental results, using the Korringa-Kohn-Rostoker coherent potential approximation (KKR-CPA) method and Monte Carlo simulation, we study the mechanism of ferromagnetic behavior of (In,Fe)As. We show that with doped Be atoms occupying in interstitial sites, chemical pair interactions between atoms and magnetic exchange interactions between Fe atoms change due to electron concentration. Therefore, by controlling the doping process, magnetic behavior of (In,Fe)As is controlled and ferromagnetism is observed in this semiconductor.

  2. Long-term research in Japan: amorphous metals, metal oxide varistors, high-power semiconductors and superconducting generators

    SciTech Connect

    Hane, G.J.; Yorozu, M.; Sogabe, T.; Suzuki, S.

    1985-04-01

    The review revealed that significant activity is under way in the research of amorphous metals, but that little fundamental work is being pursued on metal oxide varistors and high-power semiconductors. Also, the investigation of long-term research program plans for superconducting generators reveals that activity is at a low level, pending the recommendations of a study currently being conducted through Japan's Central Electric Power Council.

  3. Method for sputtering a PIN amorphous silicon semi-conductor device having partially crystallized P and N-layers

    DOEpatents

    Moustakas, Theodore D.; Maruska, H. Paul

    1985-07-09

    A high efficiency amorphous silicon PIN semiconductor device having partially crystallized (microcrystalline) P and N layers is constructed by the sequential sputtering of N, I and P layers and at least one semi-transparent ohmic electrode. The method of construction produces a PIN device, exhibiting enhanced electrical and optical properties, improved physical integrity, and facilitates the preparation in a singular vacuum system and vacuum pump down procedure.

  4. Oxygen deficiency and Sn doping of amorphous Ga2O3

    NASA Astrophysics Data System (ADS)

    Heinemann, M. D.; Berry, J.; Teeter, G.; Unold, T.; Ginley, D.

    2016-01-01

    The potential of effectively n-type doping Ga2O3 considering its large band gap has made it an attractive target for integration into transistors and solar cells. As a result amorphous GaOx is now attracting interest as an electron transport layer in solar cells despite little information on its opto-electrical properties. Here we present the opto-electronic properties, including optical band gap, electron affinity, and charge carrier density, for amorphous GaOx thin films deposited by pulsed laser deposition. These properties are strongly dependent on the deposition temperature during the deposition process. The deposition temperature has no significant influence on the general structural properties but produces significant changes in the oxygen stoichiometry of the films. The density of the oxygen vacancies is found to be related to the optical band gap of the GaOx layer. It is proposed that the oxygen deficiency leads to defect band below the conduction band minimum that increases the electron affinity. These properties facilitate the use of amorphous GaOx as an electron transport layer in Cu(In,Ga)Se2 and in Cu2O solar cells. Further it is shown that at low deposition temperatures, extrinsic doping with Sn is effective at low Sn concentrations.

  5. Nonlinear optical transmission of an integrated optical bent coupler in semiconductor-doped glass

    NASA Astrophysics Data System (ADS)

    Guntau, Matthias; Possner, Torsten; Braeuer, Andreas H.; Dannberg, Peter

    1991-08-01

    A technology for monomode slab and strip waveguide fabrication in semiconductor-doped glasses (SDG) is presented. On this basis, directional couplers consisting of both parallel (DC) and bent (BC) couplers of strip waveguides were realized. The optically linear and nonlinear behavior of these devices is described.

  6. Second harmonic generation in ion-exchanged waveguides of semiconductor microcrystallite-doped glasses

    NASA Astrophysics Data System (ADS)

    MacDonald, R. L.; Driscoll, T. J.; Lawandy, N. M.

    1991-09-01

    The first observations of optically encoded secondary harmonic generation in waveguides written in semiconductor doped glasses (SDGs) is reported. This new property should extend the usefulness of SDG to integrated optical systems where switching as well as frequency doubling may be required. The first ion-exchanged waveguide fabrication in potassium-based glasses is also reported.

  7. Chalcogenide amorphous nanoparticles doped poly (methyl methacrylate) with high nonlinearity for optical waveguide

    NASA Astrophysics Data System (ADS)

    Xue, Xiaojie; Nagasaka, Kenshiro; Cheng, Tonglei; Deng, Dinghuan; Zhang, Lei; Liu, Lai; Suzuki, Takenobu; Ohishi, Yasutake

    2015-03-01

    Nonlinear optical polymers show promising potential applications in photonics, for example, electro-optical devices. Poly (methyl methacrylate) (PMMA) is widely used in optical waveguides, integrated optics and optical fibers. However, PMMA has not been used for nonlinear optical waveguides since it has a low nonlinear refractive index. We successfully prepared chalcogenide amorphous nanoparticles doped PMMA that had a high nonlinearity. The As3S7 bulk glass was dissolved in propylamine to form a cluster solution. Then the As3S7/propylamine solution was added into methyl methacrylate (MMA) containing photoinitiator Irgacure 184 about 0.5 wt%. After well mixing the As3S7 nanoparticle doped MMA was transparent. Under the irradiation by a 365 nm UV lamp, As3S7 nanoparticles doped PMMA was obtained with yellow color. The third-order nonlinear optical susceptibility of As3S7 nanoparticles doped PMMA was investigated. An optical waveguide array based on the As3S7 nanoparticles doped PMMA composite of high nonlinearity was fabricated.

  8. Chemical vapor deposition of amorphous semiconductor films. Semiannual report, 1 May 1983-31 October 1984

    SciTech Connect

    Not Available

    1984-03-01

    This report presents an analysis of intrinsic and phosphorus-doped n-type amorphous silicon films deposited by LPCVD from disilane in a laminar flow tubular reactor. These films were analyzed using SIMs, ESR measurements, optical absorption, and conductivity in light and dark. CVD deposited i layers were used to make platinum Schottky barrier devices and hybrid cells utilizing glow discharge deposited layers in both the ITO/nip/Mo and ITO/pin/Mo configurations. The highest efficiency of hybrid cells with the ITO/ni(CVD)/p(GD)/Mo structure was approximately 1.5%. The highest efficiencies were obtained with thin i layers. The highest efficiency for the ITO/p(GD)/in(CVD)/Mo configuration was 4.0%. A chemical model was developed describing the gas phase reactions and film growth; the model quantitatively describes the effluent composition when the measured growth rate is input. Kinetic rate expressions and constants for growth from higher silanes are being determined for a wide range of reaction conditions.

  9. Chemical vapor deposition of amorphous semiconductor films. Semiannual report, 1 May 1984-31 October 1984

    SciTech Connect

    Baron, B.N.; Rocheleau, R.E.; Hegedus, S.S.

    1985-06-01

    This report describes the results of research done by the Institute of Energy Conversion for the Solar Energy Research Institute in 1984 on high-efficiency, stable, amorphous silicon solar cells, fabricated by chemical vapor deposition (CVD) from disilane at high growth rates. The kinetics of CVD with higher order silanes were modelled for a tubular reactor with static substrates. A gas-phase reaction network was adopted, based on published silylene insertion and decomposition pathways. Mass balances for hydrogen and all saturated silanes through octasilane were derived. Boron-doped a-Si:H p-layers were deposited by CVD at 200/sup 0/ to 250/sup 0/C. Band gap and conductivity depended strongly on the diborane fraction in the feed gas, independent of substrate temperature. The effects of intrinsic layer deposition temperature and growth rate on material properties and device performance were studied. Cell parameters of p-i-n cells were correlated with i-layer deposition temperature and growth rate. Fill factor and short-circuit current depended on deposition conditions, while open-circuit voltage did not. Effects of diborane additions to the feed gas during i-layer deposition were studied. Experimental evidence and calculations indicate high resistance at the back contact.

  10. Spectroscopy of Charge Carriers and Traps in Field-Doped Organic Semiconductors

    SciTech Connect

    Zhu, Xiaoyang; Frisbie, C Daniel

    2012-08-13

    This research project aims to achieve quantitative and molecular level understanding of charge carriers and traps in field-doped organic semiconductors via in situ optical absorption spectroscopy, in conjunction with time-resolved electrical measurements. During the funding period, we have made major progress in three general areas: (1) probed charge injection at the interface between a polymeric semiconductor and a polymer electrolyte dielectric and developed a thermodynamic model to quantitatively describe the transition from electrostatic to electrochemical doping; (2) developed vibrational Stark effect to probe electric field at buried organic semiconductor interfaces; (3) used displacement current measurement (DCM) to study charge transport at organic/dielectric interfaces and charge injection at metal/organic interfaces.

  11. Atomic scale insight into the amorphous structure of Cu doped GeTe phase-change material

    SciTech Connect

    Zhang, Linchuan; Sa, Baisheng; Zhou, Jian; Sun, Zhimei; Song, Zhitang

    2014-10-21

    GeTe shows promising application as a recording material for phase-change nonvolatile memory due to its fast crystallization speed and extraordinary amorphous stability. To further improve the performance of GeTe, various transition metals, such as copper, have been doped in GeTe in recent works. However, the effect of the doped transition metals on the stability of amorphous GeTe is not known. Here, we shed light on this problem for the system of Cu doped GeTe by means of ab initio molecular dynamics calculations. Our results show that the doped Cu atoms tend to agglomerate in amorphous GeTe. Further, base on analyzing the pair correlation functions, coordination numbers and bond angle distributions, remarkable changes in the local structure of amorphous GeTe induced by Cu are obviously seen. The present work may provide some clues for understanding the effect of early transition metals on the local structure of amorphous phase-change compounds, and hence should be helpful for optimizing the structure and performance of phase-change materials by doping transition metals.

  12. Low-Temperature Solution Processing of Amorphous Metal Oxide Semiconductors for High-Performance Thin-Film Transistors

    NASA Astrophysics Data System (ADS)

    Hennek, Jonathan W.

    The growing field of large-area flexible electronics presents the need for amorphous materials with electrical performances superior to amorphous hydrogenated silicon (a-Si:H). Metal oxide semiconductors show great promise in thin film transistors (TFTs) due to their high electron mobility (micro, 1--100 cm2V-1s-1), mechanical flexibility, and electrical stability. However, most oxide semiconductor fabrication still relies on expensive, inflexible and energy intensive vacuum deposition methods. To overcome these limitations, my thesis work has focused on developing low-temperature solution processing routes to functional metal oxide materials. In Chapter 2, we demonstrate an optimized "ink" and printing process for inkjet patterning of amorphous indium gallium zinc oxide (a-IGZO) and investigate the effects of device structure on derived electron mobility. Bottom-gate top-contact (BGTC) TFTs are fabricated and shown to exhibit electron mobilities comparable to a-Si:H. Furthermore, a record micro of 2.5 cm 2V-1s-1 is demonstrated for bottom-gate bottom-contact (BGBC) TFTs. The mechanism underlying such impressive performance is investigated using transmission line techniques, and it is shown that the semiconductor-source/drain electrode interface contact resistance is nearly an order of magnitude lower for BGBC transistors versus BGTC devices. In Chapter 3, we report the implementation of amorphous indium yttrium oxide (a-IYO) as a TFT semiconductor for the first time. Amorphous and polycrystalline IYO films are grown via a low-temperature solution process utilizing exothermic "combustion" precursors. Precursor transformation and the IYO films are analyzed by DTA, TGA, XRD, AFM, XPS, and optical transmission, revealing efficient conversion to the metal-oxide lattice, and smooth, transparent films. a-IYO TFTs fabricated with a hybrid nanodielectric exhibit impressive electron mobilities of 7.3 cm2V-1s-1 (Tanneal = 300 °C) and 5.0 cm2V-1s -1 (Tanneal = 250 °C) for 2

  13. Characteristics of Cu-doped amorphous NiO thin films formed by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Sato, Kazuya; Kim, Sangcheol; Komuro, Shuji; Zhao, Xinwei

    2016-06-01

    Transparent conducting Cu-doped NiO thin films were deposited on quartz glass substrates by radio frequency magnetron spattering. The fabricated thin films were all in amorphous phase. A relatively high transmittance of 73% was achieved. The density ratio of Ni3+/(Ni2+ + Ni3+) ions in the films decreased with increasing O2 gas pressure in the fabrication chamber, which caused a decrease in the carrier concentration of the films. The increasing pressure also led to the increase in Hall mobility. By controlling the chamber pressure and substrate temperature, p-type transparent conducting NiO films with reasonable electrical properties were obtained.

  14. Preparation of superior lubricious amorphous carbon films co-doped by silicon and aluminum

    NASA Astrophysics Data System (ADS)

    Liu, Xiaoqiang; Hao, Junying; Yang, Jun; Zheng, Jianyun; Liang, Yongmin; Liu, Weimin

    2011-09-01

    Silicon (Si) and aluminum (Al) co-doped amorphous carbon films ((Si, Al)-C:H) were deposited on Si and stainless steel substrates by radio frequency (13.56 MHz) magnetron sputtering. The Al and Si were found to jointly regulate the hybridized carbon bonds. Mechanical properties of the films were detected by nano-indention and scratch tests. The nano-indention results revealed that all the samples exhibited good elastic recovery rate, among which the highest one was beyond 84%. Besides co-regulating the hybridizations of carbon, the co-doped Si and Al also had a common regulation on the mechanical and tribological properties. Especially, the film containing 1.6 at. % of Si and 0.9 at. % of Al showed a super-low friction (< 0.01) and a superior wear resistance in ambient air.

  15. Photovoltaic characteristics of Pd doped amorphous carbon film/SiO{sub 2}/Si

    SciTech Connect

    Ma Ming; Xue Qingzhong; Chen Huijuan; Zhou Xiaoyan; Xia Dan; Lv Cheng; Xie Jie

    2010-08-09

    The Pd doped amorphous carbon (a-C:Pd) films were deposited on n-Si substrates with or without a native SiO{sub 2} layer using magnetron sputtering. The photovoltaic characteristics of the a-C:Pd/SiO{sub 2}/Si and a-C:Pd/Si junctions were studied. It is found that under light illumination of 15 mW/cm{sup 2} at room temperature, the a-C:Pd/SiO{sub 2}/Si solar cell fabricated at 350 deg. C has a high power conversion efficiency of 4.7%, which is much better than the a-C/Si junctions reported before. The enhanced conversion efficiency is ascribed to the Pd doping and the increase in sp{sup 2}-bonded carbon clusters in the carbon film caused by the high temperature deposition.

  16. Optical constants of amorphous, transparent titanium-doped tungsten oxide thin films.

    PubMed

    Ramana, C V; Baghmar, Gaurav; Rubio, Ernesto J; Hernandez, Manuel J

    2013-06-12

    We report on the optical constants and their dispersion profiles determined from spectroscopic ellipsometry (SE) analysis of the 20%-titanium (Ti) doped of tungsten oxide (WO3) thin films grown by sputter-deposition. The Ti-doped WO3 films grown in a wide range of temperatures (25-500 °C) are amorphous and optically transparent. SE data indicates that there is no significant interdiffusion at the film-substrate interface for a W-Ti oxide film growth of ~90 nm. The index refraction (n) at λ = 550 nm vary in the range of 2.17-2.31 with a gradual increase in growth temperature. A correlation between the growth conditions and optical constants is discussed. PMID:23682744

  17. Colossal positive magnetoresistance in a doped nearly magnetic semiconductor

    SciTech Connect

    Hu, R.; Thomas, K.; Lee, Y.; Vogt, T.; Choi, E.; Mitrovic, V.; Hermann, R.; Grandjean, F.; Canfield, P.; Kim, J.; Goldman, A.; Petrovic, C.

    2008-02-27

    We report on a positive colossal magnetoresistance (MR) induced by metallization of FeSb{sub 2}, a nearly magnetic or 'Kondo' semiconductor with 3d ions. We discuss the contribution of orbital MR and quantum interference to the enhanced magnetic field response of electrical resistivity.

  18. Doping-assisted defect control in compound semiconductors

    DOEpatents

    Specht, Petra; Weber, Eicke R.; Weatherford, Todd Russell

    2006-07-11

    The present invention relates to the production of thin film epilayers of III–V and other compounds with acceptor doping wherein the acceptor thermally stabilizes the epilayer, stabilize the naturally incorporated native defect population and therewith maintain the epilayer's beneficial properties upon annealing among other advantageous effects. In particular, balanced doping in which the acceptor concentration is similar to (but does not exceed) the antisite defects in the as-grown material is shown to be particularly advantageous in providing thermal stability, high resistivity and ultrashort trapping times. In particular, MBE growth of LT-GaAs epilayers with balanced Be doping is described in detail. The growth conditions greatly enhance the materials reproducibility (that is, the yield in processed devices). Such growth techniques can be transferred to other III–V materials if the growth conditions are accurately reproduced. Materials produced herein also demonstrate advantages in reproducibility, reliability and radiation hardening.

  19. Electronic properties of embedded graphene: doped amorphous silicon/CVD graphene heterostructures.

    PubMed

    Arezki, Hakim; Boutchich, Mohamed; Alamarguy, David; Madouri, Ali; Alvarez, José; Cabarrocas, Pere Roca I; Kleider, Jean-Paul; Yao, Fei; Hee Lee, Young

    2016-10-12

    Large-area graphene film is of great interest for a wide spectrum of electronic applications, such as field effect devices, displays, and solar cells, among many others. Here, we fabricated heterostructures composed of graphene (Gr) grown by chemical vapor deposition (CVD) on copper substrate and transferred to SiO2/Si substrates, capped by n‑ or p-type doped amorphous silicon (a-Si:H) deposited by plasma-enhanced chemical vapor deposition. Using Raman scattering we show that despite the mechanical strain induced by the a-Si:H deposition, the structural integrity of the graphene is preserved. Moreover, Hall effect measurements directly on the embedded graphene show that the electronic properties of CVD graphene can be modulated according to the doping type of the a-Si:H as well as its phase i.e. amorphous or nanocrystalline. The sheet resistance varies from 360 Ω sq(-1) to 1260 Ω sq(-1) for the (p)-a-Si:H/Gr (n)-a-Si:H/Gr, respectively. We observed a temperature independent hole mobility of up to 1400 cm(2) V(-1) s(-1) indicating that charge impurity is the principal mechanism limiting the transport in this heterostructure. We have demonstrated that embedding CVD graphene under a-Si:H is a viable route for large scale graphene based solar cells or display applications. PMID:27506254

  20. Role of lone-pair electrons in Sb-doped amorphous InGaZnO4: Suppression of the hole-induced lattice instability

    NASA Astrophysics Data System (ADS)

    Nahm, Ho-Hyun; Kim, Yong-Sung

    2013-04-01

    Transparent amorphous oxide semiconductors (TAOS's) are of practical importance for applications including oxide electronics and displays. Here we show the lone-pair s-electrons incorporated by for example Sb-doping can suppress the hole-induced lattice instability, which has been a major obstacle to commercial application of the TAOS-based thin film transistors. The Sb(III)-O spσ* hybridization in the top-most valence states makes the lone-pair s-electrons to capture the excited holes, the Sb(V)O6 octahedral bonding configuration by which formed is easily dissociated into the stable lone-pair Sb(III) state by recapturing conduction electrons.

  1. Molecular semiconductor-doped insulator (MSDI) heterojunctions as new transducers for chemical sensors

    NASA Astrophysics Data System (ADS)

    Bouvet, M.; Parra, V.; Suisse, J.-M.

    2011-12-01

    This article describes a new principle of transduction involving an heterojunction between a Molecular Semiconductor and a Doped Insulator (MSDI). Herein, we report on an MSDI-based sensor featuring an heterojunction between a lutetium bisphthalocyanine (LuPc2), which acts as Molecular Semiconductor (MS) and a thin film of Doped Insulator (DI) made of substituted or fluorinated copper phthalocyanine (CuFnPc, where n = 0, 8, 16). Previously, we reported the peculiar effect of the heterojunction on the MSDI's electronic behavior, suggesting this device as a new kind of transducer for gas chemosensing. Indeed, of particular significance was the key role of modulator played by the nature of the doped insulator sub-layer. While the MS thin film remains the only layer of the sensor exposed to gas atmosphere, the DI's ability to tune the electronic characteristics of the organic heterojunction allows it to drastically affect the nature of the effective charge carriers. In particular, an increase in fluorination of the doped insulator can cause an inversion of the LuPc2 response toward electron accepting (ozone, ppb level) or donating (ammonia, ppm level) gases. The present work focuses on the structural, electronic and electrical properties of the MSDI heterojunction, which have been studied by UV-vis spectroscopy, atomic force microscopy, current-voltage measurements and chemical doping, in order to shed some light on this phenomenon. The unique ambipolar nature of LuPc2 is suggested to be the main property responsible for the MSDI's unique behavior.

  2. Diamond Film Gas Sensors for Leak Detection of Semiconductor Doping Gases

    NASA Astrophysics Data System (ADS)

    Hayashi, Kazushi; Yokota, Yoshihiro; Tachibana, Takeshi; Miyata, Koichi; Kobashi, Koji; Fukunaga, Tetsuya; Takada, Tadashi

    2000-01-01

    Gas sensors for leak detection of toxic semiconductor doping gases such as PH3, B2H6, and AsH3 were fabricated using diamond films. The sensors have a double-layered structure composed of undoped and B-doped polycrystalline diamond layers with Pt electrodes. The relative changes in the resistance of the sensors were typically 10-20% for 0.2 ppm PH3 in air, and the highest value was over 100%. It was concluded that the diamond film gas sensors fabricated in the present work would be practically applicable as compact solid-state sensors with an advantage over the conventional aqueous electrolyte sensors.

  3. The doping of the polyimide alignment layer by semiconductor quantum dots

    NASA Astrophysics Data System (ADS)

    Konshina, E. A.; Galin, I. F.; Gavrish, E. O.; Vakulin, D. A.

    2013-08-01

    We investigated the electro-optic properties of nematic liquid crystal cells oriented by polyimide (PI) layer doped with 3.5 nm semiconductor quantum dots (QDs) CdSe/ZnS at concentrations of 0.05 and 0.1 wt. %. It is shown that doping PI orienting layer by QDs reduces the permittivity and the phase delay, as well as increases the electrical resistance of the cells. Also we observed deceleration of liquid crystal (LC) optical response caused by the screening effect of the orienting layer.

  4. Ferromagnetism in Dilute Magnetic Semiconductors through Defect Engineering: Li-Doped ZnO

    NASA Astrophysics Data System (ADS)

    Yi, J. B.; Lim, C. C.; Xing, G. Z.; Fan, H. M.; van, L. H.; Huang, S. L.; Yang, K. S.; Huang, X. L.; Qin, X. B.; Wang, B. Y.; Wu, T.; Wang, L.; Zhang, H. T.; Gao, X. Y.; Liu, T.; Wee, A. T. S.; Feng, Y. P.; Ding, J.

    2010-04-01

    We demonstrate, both theoretically and experimentally, that cation vacancy can be the origin of ferromagnetism in intrinsic dilute magnetic semiconductors. The vacancies can be controlled to tune the ferromagnetism. Using Li-doped ZnO as an example, we found that while Li itself is nonmagnetic, it generates holes in ZnO, and its presence reduces the formation energy of Zn vacancy, and thereby stabilizes the zinc vacancy. Room temperature ferromagnetism with p type conduction was observed in pulsed laser deposited ZnO:Li films with certain doping concentration and oxygen partial pressure.

  5. Ferromagnetism in dilute magnetic semiconductors through defect engineering: Li-doped ZnO.

    PubMed

    Yi, J B; Lim, C C; Xing, G Z; Fan, H M; Van, L H; Huang, S L; Yang, K S; Huang, X L; Qin, X B; Wang, B Y; Wu, T; Wang, L; Zhang, H T; Gao, X Y; Liu, T; Wee, A T S; Feng, Y P; Ding, J

    2010-04-01

    We demonstrate, both theoretically and experimentally, that cation vacancy can be the origin of ferromagnetism in intrinsic dilute magnetic semiconductors. The vacancies can be controlled to tune the ferromagnetism. Using Li-doped ZnO as an example, we found that while Li itself is nonmagnetic, it generates holes in ZnO, and its presence reduces the formation energy of Zn vacancy, and thereby stabilizes the zinc vacancy. Room temperature ferromagnetism with p type conduction was observed in pulsed laser deposited ZnO:Li films with certain doping concentration and oxygen partial pressure. PMID:20481907

  6. Local structure of amorphous GaN{sub 1-x}As{sub x} semiconductor alloys across the composition range

    SciTech Connect

    Levander, A. X.; Dubon, O. D.; Wu, J.; Yu, K. M.; Liliental-Weber, Z.; Walukiewicz, W.; Novikov, S. V.; Foxon, C. T.

    2013-06-28

    Typically only dilute (up to {approx}10%) highly mismatched alloys can be grown due to the large differences in atomic size and electronegativity of the host and the alloying elements. We have overcome the miscibility gap of the GaN{sub 1-x}As{sub x} system using low temperature molecular beam epitaxy. In the intermediate composition range (0.10 < x < 0.75), the resulting alloys are amorphous. To gain a better understanding of the amorphous structure, the local environment of the As and Ga atoms was investigated using extended x-ray absorption fine structure (EXAFS). The EXAFS analysis shows a high concentration of dangling bonds compared to the crystalline binary endpoint compounds of the alloy system. The disorder parameter was larger for amorphous films compared to crystalline references, but comparable with other amorphous semiconductors. By examining the Ga local environment, the dangling bond density and disorder associated with As-related and N-related bonds could be decoupled. The N-related bonds had a lower dangling bond density and lower disorder.

  7. Fabrication and characterization of thermomechanically processed sulfur and boron doped amorphous carbon films

    NASA Astrophysics Data System (ADS)

    Carlson, Lonnie

    Small scale, high power density, reliable, and long-life power supplies would be useful or even critical for space missions or the growing number of microdetectors, microsensors, and miniature vehicles. Alpha or beta particle voltaic devices could satisfy these requirements but have been shown to degrade quickly due to radiation damage. Amorphous carbon (a-C) PN junctions or PIN devices could provide radiation hardness and sufficiently high efficiency. As the range of alpha and beta particles in a-C is ˜20-120microm, much thicker films than are typical are needed to maximize collection of the particle energy. In this work, the fabrication of thermomechanically processed p- and n-type doped a-C films were investigated as a first step in the future development of radiation hard voltaic devices. Boron carbide (B4C) powder was mixed with a-C nanopowders as a possible p-type dopant with sulfur powder utilized as a possible n-type dopant. Doping levels of 2.5at%, 5.0at%, and 10.0at% were investigated for both dopants with films pressed at 109°C over a pressure range of 0.3-5.0GPa. Initial attempts to fabricate rectifying PN junctions and PIN devices was unsuccessful. Bonding properties were characterized using Raman spectroscopy with electronic properties primarily assessed using the van der Pauw method. Undoped a-C and boron-doped films were found to be slightly p-type with sulfur-doped films converting to n-type. All films were found to consist almost entirely of nano-graphitic sp2 rings with only slight changes in disorder at different pressures. Sulfur doped films were less brittle which is indicative of crosslinking. Boron doping did not significantly change the film electronic properties and is not an effective dopant at these temperatures and pressures. Sulfur doping had a greater effect and could likely be utilized as basis for an n-type material in a device. Initial irradiation studies using alpha particles showed that boron and undoped films became more p

  8. Electrothermal Annealing (ETA) Method to Enhance the Electrical Performance of Amorphous-Oxide-Semiconductor (AOS) Thin-Film Transistors (TFTs).

    PubMed

    Kim, Choong-Ki; Kim, Eungtaek; Lee, Myung Keun; Park, Jun-Young; Seol, Myeong-Lok; Bae, Hagyoul; Bang, Tewook; Jeon, Seung-Bae; Jun, Sungwoo; Park, Sang-Hee K; Choi, Kyung Cheol; Choi, Yang-Kyu

    2016-09-14

    An electro-thermal annealing (ETA) method, which uses an electrical pulse of less than 100 ns, was developed to improve the electrical performance of array-level amorphous-oxide-semiconductor (AOS) thin-film transistors (TFTs). The practicality of the ETA method was experimentally demonstrated with transparent amorphous In-Ga-Zn-O (a-IGZO) TFTs. The overall electrical performance metrics were boosted by the proposed method: up to 205% for the trans-conductance (gm), 158% for the linear current (Ilinear), and 206% for the subthreshold swing (SS). The performance enhancement were interpreted by X-ray photoelectron microscopy (XPS), showing a reduction of oxygen vacancies in a-IGZO after the ETA. Furthermore, by virtue of the extremely short operation time (80 ns) of ETA, which neither provokes a delay of the mandatory TFTs operation such as addressing operation for the display refresh nor demands extra physical treatment, the semipermanent use of displays can be realized. PMID:27552134

  9. Self-assembly of doped semiconductor nanocrystals leading to the formation of highly luminescent nanorods

    NASA Astrophysics Data System (ADS)

    Manzoor, K.; Aditya, V.; Vadera, S. R.; Kumar, N.; Kutty, T. R. N.

    2006-03-01

    Meso-scale self-assembly of doped semiconductor nanocrystals leading to the formation of monocrystalline nanorods showing enhanced photo- and electro-luminescence properties are reported. Polycrystalline ZnS: Cu +-Al 3+ nanoparticles of zinc-blended (cubic) structure with an average size of ˜4 nm were aggregated in aqueous solution and grown into nanorods of length ˜400 nm and aspect ratio ˜12. Transmission electron microscope (TEM) images indicate crystal growth mechanisms involving particle-to-particle oriented-attachment assisted by sulphur-sulphur catenation leading to covalent-linkage. The nanorods exhibit self-assembly dependant luminescence properties such as quenching of the lattice defect-related emissions accompanied by enhancement of dopant-related emission, efficient low-voltage electroluminescence (EL) and super-linear voltage-brightness EL characteristics. This study demonstrates the technological importance of aggregation based self-assembly in doped semiconductor nanosystems.

  10. Europium-doped amorphous calcium phosphate porous nanospheres: preparation and application as luminescent drug carriers

    PubMed Central

    2011-01-01

    Calcium phosphate is the most important inorganic constituent of biological tissues, and synthetic calcium phosphate has been widely used as biomaterials. In this study, a facile method has been developed for the fabrication of amorphous calcium phosphate (ACP)/polylactide-block-monomethoxy(polyethyleneglycol) hybrid nanoparticles and ACP porous nanospheres. Europium-doping is performed to enable photoluminescence (PL) function of ACP porous nanospheres. A high specific surface area of the europium-doped ACP (Eu3+:ACP) porous nanospheres is achieved (126.7 m2/g). PL properties of Eu3+:ACP porous nanospheres are investigated, and the most intense peak at 612 nm is observed at 5 mol% Eu3+ doping. In vitro cytotoxicity experiments indicate that the as-prepared Eu3+:ACP porous nanospheres are biocompatible. In vitro drug release experiments indicate that the ibuprofen-loaded Eu3+:ACP porous nanospheres show a slow and sustained drug release in simulated body fluid. We have found that the cumulative amount of released drug has a linear relationship with the natural logarithm of release time (ln(t)). The Eu3+:ACP porous nanospheres are bioactive, and can transform to hydroxyapatite during drug release. The PL properties of drug-loaded nanocarriers before and after drug release are also investigated. PMID:21711603

  11. Europium-doped amorphous calcium phosphate porous nanospheres: preparation and application as luminescent drug carriers.

    PubMed

    Chen, Feng; Zhu, Ying-Jie; Zhang, Kui-Hua; Wu, Jin; Wang, Ke-Wei; Tang, Qi-Li; Mo, Xiu-Mei

    2011-01-01

    Calcium phosphate is the most important inorganic constituent of biological tissues, and synthetic calcium phosphate has been widely used as biomaterials. In this study, a facile method has been developed for the fabrication of amorphous calcium phosphate (ACP)/polylactide-block-monomethoxy(polyethyleneglycol) hybrid nanoparticles and ACP porous nanospheres. Europium-doping is performed to enable photoluminescence (PL) function of ACP porous nanospheres. A high specific surface area of the europium-doped ACP (Eu3+:ACP) porous nanospheres is achieved (126.7 m2/g). PL properties of Eu3+:ACP porous nanospheres are investigated, and the most intense peak at 612 nm is observed at 5 mol% Eu3+ doping. In vitro cytotoxicity experiments indicate that the as-prepared Eu3+:ACP porous nanospheres are biocompatible. In vitro drug release experiments indicate that the ibuprofen-loaded Eu3+:ACP porous nanospheres show a slow and sustained drug release in simulated body fluid. We have found that the cumulative amount of released drug has a linear relationship with the natural logarithm of release time (ln(t)). The Eu3+:ACP porous nanospheres are bioactive, and can transform to hydroxyapatite during drug release. The PL properties of drug-loaded nanocarriers before and after drug release are also investigated. PMID:21711603

  12. Small Reactor for Semiconductor Production by Neutron Transmutation Doping

    SciTech Connect

    Obara, Toru; Hong, Liem Peng

    2010-06-22

    New concept of small size nuclear reactor is proposed for Neutron Transmutation Doping (NTD). The reactor core consists of conventional PWR type fuel elements with light water moderator/coolant unlike conventional research reactors. Graphite reflector is employed for large neutron irradiation volume. Silicon ingots are put into the reflector region for irradiation. Neutronic analysis results show that this concept has possibility to product large amount of silicon ingots which have large diameter. An optimal reactor design and its performance are shown as a result of analysis in the paper.

  13. Electrostatic analysis of n-doped SrTiO3 metal-insulator-semiconductor systems

    NASA Astrophysics Data System (ADS)

    Kamerbeek, A. M.; Banerjee, T.; Hueting, R. J. E.

    2015-12-01

    Electron doped SrTiO3, a complex-oxide semiconductor, possesses novel electronic properties due to its strong temperature and electric-field dependent permittivity. Due to the high permittivity, metal/n-SrTiO3 systems show reasonably strong rectification even when SrTiO3 is degenerately doped. Our experiments show that the insertion of a sub nanometer layer of AlOx in between the metal and n-SrTiO3 interface leads to a dramatic reduction of the Schottky barrier height (from around 0.90 V to 0.25 V). This reduces the interface resistivity by 4 orders of magnitude. The derived electrostatic analysis of the metal-insulator-semiconductor (n-SrTiO3) system is consistent with this trend. When compared with a Si based MIS system, the change is much larger and mainly governed by the high permittivity of SrTiO3. The non-linear permittivity of n-SrTiO3 leads to unconventional properties such as a temperature dependent surface potential non-existent for semiconductors with linear permittivity such as Si. This allows tuning of the interfacial band alignment, and consequently the Schottky barrier height, in a much more drastic way than in conventional semiconductors.

  14. Spectroscopy of Charge Carriers and Traps in Field-Doped Single Crystal Organic Semiconductors

    SciTech Connect

    Zhu, Xiaoyang

    2014-12-10

    The proposed research aims to achieve quantitative, molecular level understanding of charge carriers and traps in field-doped crystalline organic semiconductors via in situ linear and nonlinear optical spectroscopy, in conjunction with transport measurements and molecular/crystal engineering. Organic semiconductors are emerging as viable materials for low-cost electronics and optoelectronics, such as organic photovoltaics (OPV), organic field effect transistors (OFETs), and organic light emitting diodes (OLEDs). Despite extensive studies spanning many decades, a clear understanding of the nature of charge carriers in organic semiconductors is still lacking. It is generally appreciated that polaron formation and charge carrier trapping are two hallmarks associated with electrical transport in organic semiconductors; the former results from the low dielectric constants and weak intermolecular electronic overlap while the latter can be attributed to the prevalence of structural disorder. These properties have lead to the common observation of low charge carrier mobilities, e.g., in the range of 10-5 - 10-3 cm2/Vs, particularly at low carrier concentrations. However, there is also growing evidence that charge carrier mobility approaching those of inorganic semiconductors and metals can exist in some crystalline organic semiconductors, such as pentacene, tetracene and rubrene. A particularly striking example is single crystal rubrene (Figure 1), in which hole mobilities well above 10 cm2/Vs have been observed in OFETs operating at room temperature. Temperature dependent transport and spectroscopic measurements both revealed evidence of free carriers in rubrene. Outstanding questions are: what are the structural features and physical properties that make rubrene so unique? How do we establish fundamental design principles for the development of other organic semiconductors of high mobility? These questions are critically important but not comprehensive, as the nature of

  15. Effects of molybdenum doping and thermal annealing on the physical properties of amorphous In–Zn–O films

    SciTech Connect

    Liu, Shiu-Jen; Wu, Kuei-Ching; Peng, Kun-Cheng

    2015-06-15

    Highlights: • The effects of Mo doping and thermal annealing on a-IZO films were studied. • The carrier mobility of Mo-doped a-IZO films was enhanced by thermal annealing. • The optical bandgap of a-IZO films was unaffected by Mo doping. • Ferromagnetism was observed in Mo-doped a-IZO films after annealing. - Abstract: Amorphous In–Zn–O (a-IZO) films doped with Mo were prepared on glass substrates by using magnetron co-sputtering technique. The Mo concentration was controlled by varying the sputtering power applied on the Mo target. The effects of Mo doping and thermal annealing on the electrical, optical and magnetic properties of the a-IZO films were studied. The electrical properties of a-IZO films were found to be strongly affected by Mo doping and thermal annealing. The optical transmission near the absorption edge of a-IZO films is enhanced by Mo doping due to the decrease in reflection. The optical bandgap estimated to be 3.2 eV of a-IZO films is unaffected by Mo doping and thermal annealing. Moreover, some of Mo-doped films exhibit room-temperature ferromagnetism after annealing.

  16. Comparison of Magnetic Property of Cu-, Al-, and Li-DOPED ZnO Dilute Magnetic Semiconductor Thin Films

    NASA Astrophysics Data System (ADS)

    van, L. H.; Ding, J.; Hong, M. H.; Fan, Z. C.; Wang, L.

    The properties of Cu-, Al-, and Li-doped ZnO dilute magnetic semiconductor (DMS) have been analyzed and compared. Zincite with wurtzite structures have been synthesized successfully on SiO2 (101) and SiO2 (110) substrates in both the Cu-ZnO and Li-ZnO DMS. The highly textured ZnO (002) peaks were able to form in the Cu-ZnO system at 400°C. However, it formed at even much lower temperature in the Li-ZnO system, that is only 25°C. ZnO (002) peaks in both systems were formed without any impurity phases. However, no crystalline structure is synthesized in the Al-ZnO system. The thin films formed are amorphous. The structural and related magnetic properties of the films were analyzed by XRD, AFM, and VSM. The films were found to be at their highest magnetism at the value of 3.1 emu/cm3 for Co-ZnO and 2.5 emu/cm3 for Li-ZnO, synthesized at 400°C, and under 1 × 10-4 Torr oxygen partial pressure.

  17. Hydrogen plasma treatment for improved conductivity in amorphous aluminum doped zinc tin oxide thin films

    SciTech Connect

    Morales-Masis, M. Ding, L.; Dauzou, F.; Jeangros, Q.; Hessler-Wyser, A.; Nicolay, S.; Ballif, C.

    2014-09-01

    Improving the conductivity of earth-abundant transparent conductive oxides (TCOs) remains an important challenge that will facilitate the replacement of indium-based TCOs. Here, we show that a hydrogen (H{sub 2})-plasma post-deposition treatment improves the conductivity of amorphous aluminum-doped zinc tin oxide while retaining its low optical absorption. We found that the H{sub 2}-plasma treatment performed at a substrate temperature of 50 °C reduces the resistivity of the films by 57% and increases the absorptance by only 2%. Additionally, the low substrate temperature delays the known formation of tin particles with the plasma and it allows the application of the process to temperature-sensitive substrates.

  18. Hydrogen plasma treatment for improved conductivity in amorphous aluminum doped zinc tin oxide thin films

    NASA Astrophysics Data System (ADS)

    Morales-Masis, M.; Ding, L.; Dauzou, F.; Jeangros, Q.; Hessler-Wyser, A.; Nicolay, S.; Ballif, C.

    2014-09-01

    Improving the conductivity of earth-abundant transparent conductive oxides (TCOs) remains an important challenge that will facilitate the replacement of indium-based TCOs. Here, we show that a hydrogen (H2)-plasma post-deposition treatment improves the conductivity of amorphous aluminum-doped zinc tin oxide while retaining its low optical absorption. We found that the H2-plasma treatment performed at a substrate temperature of 50 °C reduces the resistivity of the films by 57% and increases the absorptance by only 2%. Additionally, the low substrate temperature delays the known formation of tin particles with the plasma and it allows the application of the process to temperature-sensitive substrates.

  19. First-principles study of nitrogen doping in cubic and amorphous Ge2Sb2Te5.

    PubMed

    Caravati, S; Colleoni, D; Mazzarello, R; Kühne, T D; Krack, M; Bernasconi, M; Parrinello, M

    2011-07-01

    We investigated the structural, electronic and vibrational properties of amorphous and cubic Ge(2)Sb(2)Te(5) doped with N at 4.2 at.% by means of large scale ab initio simulations. Nitrogen can be incorporated in molecular form in both the crystalline and amorphous phases at a moderate energy cost. In contrast, insertion of N in the atomic form is very energetically costly in the crystalline phase, though it is still possible in the amorphous phase. These results support the suggestion that N segregates at the grain boundaries during the crystallization of the amorphous phase, resulting in a reduction in size of the crystalline grains and an increased crystallization temperature. PMID:21673401

  20. Effect of solid-phase amorphization on the spectral characteristics of europium-doped gadolinium molybdate

    NASA Astrophysics Data System (ADS)

    Shmurak, S. Z.; Kiselev, A. P.; Kurmasheva, D. M.; Red'Kin, B. S.; Sinitsyn, V. V.

    2010-05-01

    A method is proposed for detecting spectral characteristics of optically inactive molybdates of rare-earth elements by their doping with rare-earth ions whose luminescence lies in the transparency region of all structural modifications of the sample. Gadolinium molybdate is chosen as the object of investigations, while europium ions are used as an optically active and structurally sensitive admixture. It is shown that after the action of a high pressure under which gadolinium molybdate passes to the amorphous state, the spectral characteristics of Gd1.99Eu0.01(MoO4)3 (GMO:Eu) change radically; namely, considerable line broadening is observed in the luminescence spectra and the luminescence excitation spectra, while the long-wave threshold of optical absorption is shifted considerably (by approximately 1.1 eV) towards lower energies. It is found that by changing the structural state of GMO:Eu by solid-state amorphization followed by annealing, the spectral characteristics of the sample can be purposefully changed. This is extremely important for solving the urgent problem of designing high-efficiency light-emitting diodes producing “white” light.

  1. Transition metal doped semiconductor quantum dots: Optical and magnetic properties

    NASA Astrophysics Data System (ADS)

    Dahnovsky, Yuri; Proshchenko, Vitaly; Pimachev, Artem

    We study optical and magnetic properties of CdSe and Cd-Mn-Se quantum dots (QD). We find that there are two luminescence lines, one is fast and another is slow (~1ms). With the increase of a QD diameter the slow luminescence disappears at some critical QD size, thus only one line (fast) remains. Using the SAC SI computational method we find that D = 3.2 nm and D = 2.7 nm if the Mn impurity is located inside a QD or on a QD surface, respectively. For two or four Mn atoms in the quantum dot, now absorption takes place because the transition is spin-allowed. The DFT calculations of the magnetic state reveal that it is an antiferromagnet. We also study other quantum dots such as Cd-Mn-Se, Zn-Mn-S, and Zn-Mn-Se, doped and undoped. We find the slow luminescence energies for low concentrations of Mn impurities for each QD type. The calculations indicate that two luminescence lines, fast and slow, should always take place. However for Pb-Mn-S quantum dots there are now Mn levels inside a HOMO-LUMO gap, i.e., the Mn-levels are located in a PbS conduction band. The presence of Mn dopants increases the band gap and also removes the exciton peak. This effect is different to the other quantum dots.

  2. Amorphous Phosphorus/Nitrogen-Doped Graphene Paper for Ultrastable Sodium-Ion Batteries.

    PubMed

    Zhang, Chao; Wang, Xi; Liang, Qifeng; Liu, Xizheng; Weng, Qunhong; Liu, Jiangwei; Yang, Yijun; Dai, Zhonghua; Ding, Kejian; Bando, Yoshio; Tang, Jie; Golberg, Dmitri

    2016-03-01

    As the most promising anode material for sodium-ion batteries (SIBs), elemental phosphorus (P) has recently gained a lot of interest due to its extraordinary theoretical capacity of 2596 mAh/g. The main drawback of a P anode is its low conductivity and rapid structural degradation caused by the enormous volume expansion (>490%) during cycling. Here, we redesigned the anode structure by using an innovative methodology to fabricate flexible paper made of nitrogen-doped graphene and amorphous phosphorus that effectively tackles this problem. The restructured anode exhibits an ultrastable cyclic performance and excellent rate capability (809 mAh/g at 1500 mA/g). The excellent structural integrity of the novel anode was further visualized during cycling by using in situ experiments inside a high-resolution transmission electron microscope (HRTEM), and the associated sodiation/desodiation mechanism was also thoroughly investigated. Finally, density functional theory (DFT) calculations confirmed that the N-doped graphene not only contributes to an increase in capacity for sodium storage but also is beneficial in regards to improved rate performance of the anode. PMID:26928163

  3. Towards a new class of heavy ion doped magnetic semiconductors for room temperature applications

    PubMed Central

    Lee, Juwon; Subramaniam, Nagarajan Ganapathi; Agnieszka Kowalik, Iwona; Nisar, Jawad; Lee, Jaechul; Kwon, Younghae; Lee, Jaechoon; Kang, Taewon; Peng, Xiangyang; Arvanitis, Dimitri; Ahuja, Rajeev

    2015-01-01

    The article presents, using Bi doped ZnO, an example of a heavy ion doped oxide semiconductor, highlighting a novel p-symmetry interaction of the electronic states to stabilize ferromagnetism. The study includes both ab initio theory and experiments, which yield clear evidence for above room temperature ferromagnetism. ZnBixO1−x thin films are grown using the pulsed laser deposition technique. The room temperature ferromagnetism finds its origin in the holes introduced by the Bi doping and the p-p coupling between Bi and the host atoms. A sizeable magnetic moment is measured by means of x-ray magnetic circular dichroism at the O K-edge, probing directly the spin polarization of the O(2p) states. This result is in agreement with the theoretical predictions and inductive magnetometry measurements. Ab initio calculations of the electronic and magnetic structure of ZnBixO1−x at various doping levels allow to trace the origin of the ferromagnetic character of this material. It appears, that the spin-orbit energy of the heavy ion Bi stabilizes the ferromagnetic phase. Thus, ZnBixO1−x doped with a heavy non-ferromagnetic element, such as Bi, is a credible example of a candidate material for a new class of compounds for spintronics applications, based on the spin polarization of the p states. PMID:26592564

  4. Stabilization of Ferromagnetic States by Electron Doping in ZnO-Based Diluted Magnetic Semiconductors

    NASA Astrophysics Data System (ADS)

    Sato, Kazunori; Katayama-Yoshida, Hiroshi

    2001-03-01

    In order to investigate functionality of ZnO as a diluted magnetic semiconductor (DMS), we had studied the magnetism in ZnO doped with 3d transition metal atoms (TM) and showed that it was also a candidate for a new functional magnetic material [1]. In this paper, we develop our previous work and give detailed materials design with ZnO-based DMS based on ab initio calculations. The electronic structure of a TM-doped ZnO was calculated within the local density approximation by the Korringa-Kohn-Rostoker method combined with the coherent potential approximation. Total energies of Zn_1-xTM^\\uparrow_xO and Zn_1-xTM^\\uparrow_x/2TM^downarrow_x/2O, where up and down arrows mean the directions of respective atomic magnetic moments, were compared and appearance of the ferromagnetism was discussed. Effects of carrier doping to these systems were also considered. It was found that their magnetic states were controllable by changing the carrier density. In particular, ferromagnetic states were stabilized by electron doping in the case of Fe, Co or Ni doped ZnO. From the point of practical applications, it is favorable feature to realize high Curie temperature ferromagnet, because n-type ZnO is easily available. [1] K. Sato and H. Katayama-Yoshida, Jpn. J. Appl. Phys. 39 (2000) L555.

  5. Manipulable GMR Effect in a δ-Doped Magnetically Confined Semiconductor Heterostructure

    NASA Astrophysics Data System (ADS)

    Jiang, Ya-Qing; Lu, Mao-Wang; Huang, Xin-Hong; Yang, Shi-Peng; Tang, Qiang

    2016-06-01

    A giant magnetoresistance (GMR) device formed by depositing two parallel nanosized ferromagnetic strips on top of a semiconductor heterostructure has been proposed theoretically (Zhai et al. in Phys Rev B 66:125305, 2002). For the sake of manipulating its performance, we introduce a tunable δ-potential into this device with the help of atomic-layer doping techniques such as molecular beam epitaxy (MBE) or metal-organic chemical-vapor deposition. We investigate theoretically the impact of such δ-doping on the magnetoresistance ratio (MR) of the GMR device. We find that, although the δ-doping is embedded in the device, a considerable GMR effect still exists due to the significant difference in electronic transmission between parallel (P) and antiparallel (AP) configurations. Moreover, the calculated results show that the MR of the GMR device varies sensitively with the weight and/or position of the δ-doping. Thus, the GMR device can be controlled by changing the δ-doping to obtain an adjustable GMR device for magnetoelectronics applications.

  6. Power and length requirements for all-optical switching in semiconductor-doped glass waveguides

    NASA Astrophysics Data System (ADS)

    Mayweather, Derek T.; Digonnet, Michel J. F.; Pantell, Richard H.; Shaw, H. J.

    1994-10-01

    We present a theoretical model that computes the nonlinear index (n2) of semiconductor- doped glasses (SDG), based on the material's properties, and predicts the power and length requirements, as well as the optimum operating wavelengths, for an all-optical SDG waveguide switch. The main conclusions are that (1) n2 depends strongly on pump intensity, which partly explains the large disparity in reported values of n2, (2) the pump and signal wavelengths should be in specific and different ranges to minimize switching power and signal loss, (3) for CdSSe- and CdTe-doped glasses, n2 is relatively small, and the switching power requirement for these two SDGs is consequently quite high (2 - 16 W). We provide evidence that this weak nonlinearity, compared to that of similar semiconductors in bulk, is due to the strong nonradiative recombination of carriers arising from the small size of the semiconductor microcrystallites. Projections indicate that the switching power would be reduced by up to three orders of magnitude by increasing the microcrystallite size, thus producing a slower (ns) but more power-efficient switch.

  7. Hydrogen Doped Metal Oxide Semiconductors with Exceptional and Tunable Localized Surface Plasmon Resonances.

    PubMed

    Cheng, Hefeng; Wen, Meicheng; Ma, Xiangchao; Kuwahara, Yasutaka; Mori, Kohsuke; Dai, Ying; Huang, Baibiao; Yamashita, Hiromi

    2016-07-27

    Heavily doped semiconductors have recently emerged as a remarkable class of plasmonic alternative to conventional noble metals; however, controlled manipulation of their surface plasmon bands toward short wavelengths, especially in the visible light spectrum, still remains a challenge. Here we demonstrate that hydrogen doped given MoO3 and WO3 via a facile H-spillover approach, namely, hydrogen bronzes, exhibit strong localized surface plasmon resonances in the visible light region. Through variation of their stoichiometric compositions, tunable plasmon resonances could be observed in a wide range, which hinge upon the reduction temperatures, metal species, the nature and the size of metal oxide supports in the synthetic H2 reduction process as well as oxidation treatment in the postsynthetic process. Density functional theory calculations unravel that the intercalation of hydrogen atoms into the given host structures yields appreciable delocalized electrons, enabling their plasmonic properties. The plasmonic hybrids show potentials in heterogeneous catalysis, in which visible light irradiation enhanced catalytic performance toward p-nitrophenol reduction relative to dark condition. Our findings provide direct evidence for achieving plasmon resonances in hydrogen doped metal oxide semiconductors, and may allow large-scale applications with low-price and earth-abundant elements. PMID:27384437

  8. Effects of nitrogen doping on the electrical conductivity and optical absorption of ultrananocrystalline diamond/hydrogenated amorphous carbon films prepared by coaxial arc plasma deposition

    NASA Astrophysics Data System (ADS)

    Zkria, Abdelrahman; Katamune, Yūki; Yoshitake, Tsuyoshi

    2016-07-01

    3 at. % nitrogen-doped ultrananocrystalline diamond/hydrogenated amorphous carbon composite (UNCD/a-C:H) films were synthesized by coaxial arc plasma deposition. Optically, the films possess large absorption coefficients of more than 105 cm‑1 at photon energies from 3 to 5 eV. The optical band gap was estimated to be 1.28 eV. This value is smaller than that of undoped films, which might be attributable to increased sp2 fractions. The temperature dependence of the electrical conductivity implies that carrier transport follows a hopping conduction model. Heterojunctions with p-type Si substrates exhibited a typical rectifying action. From the capacitance–voltage characteristics that evidently indicated the expansion of a depletion region into the film side, the built-in potential and carrier concentration were estimated to be 0.51 eV and 7.5 × 1016 cm‑3, respectively. It was experimentally demonstrated that nitrogen-doped UNCD/a-C:H films are applicable as an n-type semiconductor.

  9. Rare Earth Doped Semiconductors and Materials Research Society Symposium Proceedings, Volume 301

    NASA Astrophysics Data System (ADS)

    Ballance, John

    1994-02-01

    The properties of rare earth ions in solids were studied in detail for decades, but until recently this work was restricted to dominantly ionic hosts such as fluorides and oxides, and to a lesser extent to more covalently bonded hosts, such as tetrahedral 2-6 semiconductors. The idea of rare earth elements incorporated into covalent semiconductors such as GaAs and Si may be traced to a short communication in 1963 by R.L. Bell (J. Appl. Phys. 34, 1563 (1963)) proposing a dc-pumped rare earth laser. At about the same time, three unpublished technical reports appeared as a result of U.S. Department of Defense sponsored research in rare earth doped Si, GaAs, and InP to fabricate LED's. Attempts by other researchers to identify sharp 4f specific emissions in these hosts essentially failed.

  10. Development of transition-metal doped copper oxide and zinc oxide dilute magnetic semiconductors

    NASA Astrophysics Data System (ADS)

    Ivill, Mathew P.

    The field of spintronics has recently attracted much attention because of its potential to provide new functionalities and enhanced performance in conventional electronic devices. Oxide materials provide a convenient platform to study the spin-based functionality in host semiconducting material. Recent theoretical treatments predict that wide band-gap semiconductors, including ZnO, can exhibit high temperature ferromagnetic ordering when doped with transition metals. This work focused on the possibility of using wide band-gap oxide semiconductors as potential spintronic materials. The structure, magnetic, and electronic transport properties of transition-metal doped ZnO and Cu 2O were investigated. Mn and Co were used as transition metal dopants. Thin films of these materials were fabricated using pulsed laser deposition (PLD). The Mn solubility in Cu2O was found to be small and the precipitation of Mn-oxides was favored at high growth temperatures. Phase pure Mn-doped Cu2O samples were found to be non-magnetic. Samples were p-type with carrier concentrations on the order of 1014-10 16 cm-3. The effects of carrier concentration on the magnetic properties of Mn-doped ZnO were studied using Sn and P as electronic codopants. Sn acts as an n-type dopant providing extra electrons to the ZnO. P acts as a p-type dopant that supplies excess holes to compensate the native electron concentration in ZnO. The electron concentration was decreased using P, but the films remained n-type. An inverse correlation was found between the ferromagnetism and the electron concentration; the ferromagnetic coupling between Mn spins increased with decreasing electron concentration. The nature of ferromagnetism in Co-doped ZnO was also investigated. Ferromagnetism was found in films deposited at 400°C in vacuum, while films deposited in oxygen or at higher temperatures were non-magnetic. Films deposited under vacuum had rather high electron concentrations and were presumably doped with

  11. Controlled electrical doping of organic semiconductors: a combined intra- and intermolecular perspective from first principles.

    PubMed

    Joo, Bora; Kim, Eung-Gun

    2016-07-21

    The process of introducing extra charge carriers into organic semiconductors, or simply molecular doping, takes place via intermolecular charge transfer from the donor to the acceptor molecule. Using density functional theory calculations on diverse donor-acceptor pairs, we show that there are two modes of charge transfer; in one, charge transfer is controlled by the sign and in the other, by the magnitude of the donor HOMO-acceptor LUMO level offset. Despite doping being an intermolecular process, the identification of the transfer modes requires a full account of intramolecular geometric changes during charge transfer. We further show that the degree of charge transfer can be represented entirely by the reorganization energy, a common measure of geometric changes, of either the donor or the acceptor. PMID:27314750

  12. Boron-doped amorphous diamondlike carbon as a new p-type window material in amorphous silicon p-i-n solar cells

    SciTech Connect

    Lee, C.H.; Lim, K.S.

    1998-01-01

    A boron-doped hydrogenated amorphous diamondlike carbon (a-DLC:H) was prepared using a mercury-sensitized photochemical vapor deposition (photo-CVD) method. The source gases were B{sub 2}H{sub 6} and C{sub 2}H{sub 4}. By increasing the boron doping ratio (B{sub 2}H{sub 6}/C{sub 2}H{sub 4}) from 0 to 12000 ppm, the dark conductivity increased from {approximately}10{sup {minus}9} to {approximately}10{sup {minus}7} S/cm. A boron-doped a-DLC:H with an energy band gap of 3.8 eV and a dark conductivity of 1.3{times}10{sup {minus}8} S/cm was obtained at a doping ratio of 3600 ppm. By using this film, amorphous silicon (a-Si) solar cells with a novel p-a-DLC:H/p-a-SiC double p-layer structure were fabricated using the photo-CVD method and the cell photovoltaic characteristics were investigated as a function of a-DLC:H layer thickness. The open circuit voltage increased from 0.766 V for the conventional cell with a 40-{Angstrom}-thick p-a-SiC to 0.865 V for the cell with a p-a-DLC:H (15 {Angstrom})/p-a-SiC (40 {Angstrom}) double p-layer structure. The thin ({lt}15 {Angstrom}) p-a-DLC:H layer proved to be an excellent hole emitter as a wide band gap window layer. {copyright} {ital 1998 American Institute of Physics.}

  13. Madelung and Hubbard interactions in polaron band model of doped organic semiconductors.

    PubMed

    Png, Rui-Qi; Ang, Mervin C Y; Teo, Meng-How; Choo, Kim-Kian; Tang, Cindy Guanyu; Belaineh, Dagmawi; Chua, Lay-Lay; Ho, Peter K H

    2016-01-01

    The standard polaron band model of doped organic semiconductors predicts that density-of-states shift into the π-π* gap to give a partially filled polaron band that pins the Fermi level. This picture neglects both Madelung and Hubbard interactions. Here we show using ultrahigh workfunction hole-doped model triarylamine-fluorene copolymers that Hubbard interaction strongly splits the singly-occupied molecular orbital from its empty counterpart, while Madelung (Coulomb) interactions with counter-anions and other carriers markedly shift energies of the frontier orbitals. These interactions lower the singly-occupied molecular orbital band below the valence band edge and give rise to an empty low-lying counterpart band. The Fermi level, and hence workfunction, is determined by conjunction of the bottom edge of this empty band and the top edge of the valence band. Calculations are consistent with the observed Fermi-level downshift with counter-anion size and the observed dependence of workfunction on doping level in the strongly doped regime. PMID:27582355

  14. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

    SciTech Connect

    Baca, A.G.; Brown, D.J.; Donaldson, R.D.; Helgeson, W.D.; Hjalmarson, H.P.; Loubriel, G.M.; Mar, A.; O'Malley, M.W.; Thornton, R.L.; Zutavern, F.J.

    1999-08-05

    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 50 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer beneath the PCSS contacts which is very effective in the suppression of filament formation and alleviating current crowding to improve the longevity of PCSS. Virtually indefinite, damage-free operation is now possible at much higher current levels than before. The inherent damage-free current capacity of the switch depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approximately}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

  15. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

    SciTech Connect

    MAR,ALAN; LOUBRIEL,GUILLERMO M.; ZUTAVERN,FRED J.; O'MALLEY,MARTIN W.; HELGESON,WESLEY D.; BROWN,DARWIN JAMES; HJALMARSON,HAROLD P.; BACA,ALBERT G.; THORNTON,R.L.; DONALDSON,R.D.

    1999-12-17

    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 100 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer that is very effective in the suppression of filament formation, alleviating current crowding. Damage-free operation is now possible with virtually infinite expected lifetime at much higher current levels than before. The inherent damage-free current capacity of the bulk GaAs itself depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approx}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs, unlike a switch with conventional contacts. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

  16. Comparison of the electronic structure of amorphous versus crystalline indium gallium zinc oxide semiconductor: structure, tail states and strain effects

    NASA Astrophysics Data System (ADS)

    de Jamblinne de Meux, A.; Pourtois, G.; Genoe, J.; Heremans, P.

    2015-11-01

    We study the evolution of the structural and electronic properties of crystalline indium gallium zinc oxide (IGZO) upon amorphization by first-principles calculation. The bottom of the conduction band (BCB) is found to be constituted of a pseudo-band of molecular orbitals that resonate at the same energy on different atomic sites. They display a bonding character between the s orbitals of the metal sites and an anti-bonding character arising from the interaction between the oxygen and metal s orbitals. The energy level of the BCB shifts upon breaking of the crystal symmetry during the amorphization process, which may be attributed to the reduction of the coordination of the cationic centers. The top of the valence band (TVB) is constructed from anti-bonding oxygen p orbitals. In the amorphous state, they have random orientation, in contrast to the crystalline state. This results in the appearance of localized tail states in the forbidden gap above the TVB. Zinc is found to play a predominant role in the generation of these tail states, while gallium hinders their formation. Last, we study the dependence of the fundamental gap and effective mass of IGZO on mechanical strain. The variation of the gap under strain arises from the enhancement of the anti-bonding interaction in the BCB due to the modification of the length of the oxygen-metal bonds and/or to a variation of the cation coordination. This effect is less pronounced for the amorphous material compared to the crystalline material, making amorphous IGZO a semiconductor of choice for flexible electronics. Finally, the effective mass is found to increase upon strain, in contrast to regular materials. This counterintuitive variation is due to the reduction of the electrostatic shielding of the cationic centers by oxygen, leading to an increase of the overlaps between the metal orbitals at the origin of the delocalization of the BCB. For the range of strain typically met in flexible electronics, the induced

  17. Study on Solid-Phase Crystallization of Amorphized Vanadium-Doped ZnO Thin Films

    NASA Astrophysics Data System (ADS)

    Watanabe, Akihiro; Chiba, Hiroshi; Kawashima, Tomoyuki; Washio, Katsuyoshi

    2016-04-01

    The effects of post-annealing and film thickness on the solid-phase crystallization (SPC) of amorphized vanadium-doped ZnO (VZO) thin films were investigated. The 2-500-nm-thick VZO (V of about 4 at.%) thin films were deposited on a c-face sapphire substrate at room temperature by RF magnetron sputtering and subsequently were annealed at an annealing temperature (T A) from 700°C to 900°C in a nitrogen atmosphere. From in-plane x-ray diffraction (XRD) measurements, the as-deposited VZO film had a faint in-plane orientation at the initial stage of deposition. However, the ZnO(100) XRD intensity weakened with increasing film thickness and no diffraction peak was seen over 35-nm thick. That is, the pseudo-amorphous film was fabricated. By annealing the 100-nm-thick VZO film over 700°C, the sixfold symmetry appeared. The ZnO(100) XRD intensity increased sharply at a T A of 800°C and was saturated at a higher T A. The c axis orientation reached a peak at a T A of 800°C according to the ZnO(002) XRD intensity. Concerning the effect of film thickness in the case of T A = 800°C, both the in-plane and c axis orientation improved up to 100-nm thick and deteriorated over it. At a T A ≥ 850°C or film thickness ≥200 nm, where the c axis orientation was deteriorated, the secondary phase-like Zn3V2O8 was formed. As a result, it is found that the careful selection of the T A and film thickness is necessary to avoid the formation of secondary phase-like Zn3V2O8 to fabricate the high-quality buffer layer via SPC.

  18. Theoretical and experimental investigations of superconductivity. Amorphous semiconductors, superconductivity and magnetism

    NASA Technical Reports Server (NTRS)

    Cohen, M. H.

    1973-01-01

    The research activities from 1 March 1963 to 28 February 1973 are summarized. Major lectures are listed along with publications on superconductivity, superfluidity, electronic structures and Fermi surfaces of metals, optical spectra of solids, electronic structure of insulators and semiconductors, theory of magnetic metals, physics of surfaces, structures of metals, and molecular physics.

  19. Ab initio search for novel bipolar magnetic semiconductors: Layered YZnAsO doped with Fe and Mn

    NASA Astrophysics Data System (ADS)

    Bannikov, V. V.; Ivanovskii, A. L.

    2013-02-01

    Very recently, the newest class of spintronic materials, where reversible spin polarization can be controlled by applying gate voltage: so-called bipolar magnetic semiconductors (Xingxing Li et al., arXiv:1208.1355) was proposed. In this work, a novel way to creation of bipolar magnetic semiconductors by doping of non-magnetic semiconducting 1111 phases with magnetic d n < 10 atoms is discussed using ab initio calculations of layered YZnAsO doped with Fe and Mn. In addition, more complex materials with several spectral intervals with opposite 100% spin polarization where multiple gate-controlled spin-polarization can be expected are proposed.

  20. A structurally-controllable spin filter in a δ-doped magnetically modulated semiconductor nanostructure with zero average magnetic field

    NASA Astrophysics Data System (ADS)

    Shen, Li-Hua; Ma, Wen-Yue; Zhang, Gui-Lian; Yang, Shi-Peng

    2015-07-01

    We report on a theoretical investigation of spin-polarized transport in a δ-doped magnetically modulated semiconductor nanostructure, which can be experimentally realized by depositing a ferromagnetic stripe on the top of a semiconductor heterostructure and by using the atomic layer doping technique such as molecular beam epitaxy (MBE). It is shown that although such a nanostructure has a zero average magnetic filed, a sizable spin polarization exists due to the Zeeman splitting mechanism. It is also shown that the degree of spin polarization varies sensitively with the weight and/or position of the δ-doping. Therefore, one can conveniently tailor the behaviour of the spin-polarized electron by tuning the δ -doping, and such a device can be employed as a controllable spin filter for spintronics.

  1. Femtosecond Dynamics and Nonlinear Effects of Electron-Hole Plasma in Semiconductor Doped Glasses.

    NASA Astrophysics Data System (ADS)

    Olbright, Gregory Richard

    The following is a comprehensive study of transient and steady-state nonlinear optical properties of semiconductor microcrystals embedded in a glass matrix (semiconductor doped glass). Transient thermal effects which give rise to longitudinal excitation discontinuities (i.e., kinks) that arise from partial sample switching in increasing absorption optical bistability are observed in a doped glass. The transient thermal effects occur on time scales of a few hundred milliseconds. Femtosecond and nanosecond laser pulses are employed to measure time-resolved and steady-state transmission and differential transmission spectra. The measured spectra reveal several beautiful effects which are attributed to the many-particle effects of electron-hole plasma. The spectra reveal: bandgap renormalization, broadening of the tail states and screening of the continuum states, state filling (spectral hole burning), thermalization of nonthermal carrier population distributions, band filling due to carrier relaxation of the thermal and nonthermal distributions, direct electron-hole recombination and long lived (>>100 ps) tail states which are attributed to electron trapping. Absorption edge dynamics discussed in this dissertation span 15 orders of magnitude.

  2. Syntheses and applications of Mn-doped II-VI semiconductor nanocrystals.

    PubMed

    Yang, Heesun; Santra, Swadeshmukul; Holloway, Paul H

    2005-09-01

    Luminescent Mn-doped II-VI semiconductor nanocrystals have been intensively investigated over the last ten years. Several semiconductor host materials such as ZnS, CdS, and ZnSe have been used for Mn-doped nanocrystals with different synthetic routes and surface passivation. Beyond studies of their fundamental properties including photoluminescence and size, these luminescent nanocrystals have now been tested for practical applications such as electroluminescent displays and biological labeling agents (biomarkers). Here, we first review ZnS:Mn, CdS:Mn/ZnS core/shell, and ZnSe:Mn nanocrystal systems in terms of their synthetic chemistries and photoluminescent properties. Second, based on ZnS:Mn and CdS:Mn/ZnS core/shell nanocrystals as electroluminescent components, direct current electroluminescent devices having a hybrid organic/inorganic multilayer structure are reviewed. Highly luminescent and photostable CdS:Mn/ZnS nanocrystals can further be used as the luminescent biomarkers and some preliminary results are also discussed here. PMID:16193951

  3. Electrical analysis of amorphous corn starch-based polymer electrolyte membranes doped with LiI

    NASA Astrophysics Data System (ADS)

    Shukur, M. F.; Ibrahim, F. M.; Majid, N. A.; Ithnin, R.; Kadir, M. F. Z.

    2013-08-01

    In this work, polymer electrolytes have been prepared by doping starch with lithium iodide (LiI). The incorporation of 30 wt% LiI optimizes the room temperature conductivity of the electrolyte at (1.83 ± 0.47) × 10-4 S cm-1. Further conductivity enhancement to (9.56 ± 1.19) × 10-4 S cm-1 is obtained with the addition of 30 wt% glycerol. X-ray diffraction analysis indicates that the conductivity enhancement is due to the increase in amorphous content. The activation energy, Ea, of 70 wt% starch-30 wt% LiI electrolyte is 0.26 eV, while 49 wt% starch-21 wt% LiI-30 wt% glycerol electrolyte exhibits an Ea of 0.16 eV. Dielectric studies show that all the electrolytes obey non-Debye behavior. The power law exponent s is obtained from the variation of dielectric loss, ɛi, with frequency at different temperatures. The conduction mechanism of 70 wt% starch-30 wt% LiI electrolyte can be explained by the correlated barrier hopping model, while the conduction mechanism for 49 wt% starch-21 wt% LiI-30 wt% glycerol electrolyte can be represented by the quantum mechanical tunneling model.

  4. Moessbauer studies of two-electron centers with negative correlation energy in crystalline and amorphous semiconductors

    SciTech Connect

    Bordovsky, G. A.; Nemov, S. A.; Marchenko, A. V.; Seregin, P. P.

    2012-01-15

    The results of the study of donor U{sup -}-centers of tin and germanium in lead chalcogenides by Moessbauer emission spectroscopy are discussed. The published data regarding the identification of amphoteric U{sup -}-centers of tin in glassy binary arsenic and germanium chalcogenides using Moessbauer emission spectroscopy, and in multicomponent chalcogenide glasses using Moessbauer absorption spectroscopy are considered. Published data concerning the identification of two-atom U{sup -}-centers of copper in lattices of semimetal copper oxides by Moessbauer emission spectroscopy are analyzed. The published data on the detection of spatial inhomogeneity of the Bose-Einstein condensate in superconducting semiconductors and semimetal compounds, and on the existence of the correlation between the electron density in lattice sites and the superconducting transition temperature are presented. The principal possibility of using Moessbauer U{sup -}-centers as a tool for studying the Bose-Einstein condensation of electron pairs during the superconducting phase transition in semiconductors and semimetals is considered.

  5. Optically Encoded Second-Harmonic Generation in Semiconductor Microcrystallite-Doped Glass: Physics and Applications.

    NASA Astrophysics Data System (ADS)

    MacDonald, Robert Lawrence

    Semiconductor microcrystallite-doped glasses (SDG) are presented as a new class of materials for optically encoded second harmonic generation. The encoding and readout behavior of SDG is compared with that observed in homogeneous glass. An encoding model for SDG, based on directional trapping of electrons at the semiconductor-glass interface, is developed and shown to be consistent with the observed behavior and with known properties of SDG. Measured optical erasure rates of the encoded SDG provide evidence for the microscopic details of the encoding, and above bandgap erasure is used to observe charge screening in the semiconductor nanocrystals. Quantum confinement effects are observed in the intensity dependence of the encoding efficiency. Ion -exchanged ridge and channel waveguides in SDG are fabricated and encoded with as little as 2 mW average power. The measured readout wavelength dependence in bulk homogeneous glass is consistent with encoding of a chi ^{(2)} grating having a period slightly shifted from that required for quasi-phasematched second harmonic generation at the encoded wavelength. Multiple wavelength encoding is demonstrated and proposed as a new technique for optical storage and readout of information.

  6. Platinum nanoparticles on gallium nitride surfaces: effect of semiconductor doping on nanoparticle reactivity.

    PubMed

    Schäfer, Susanne; Wyrzgol, Sonja A; Caterino, Roberta; Jentys, Andreas; Schoell, Sebastian J; Hävecker, Michael; Knop-Gericke, Axel; Lercher, Johannes A; Sharp, Ian D; Stutzmann, Martin

    2012-08-01

    Platinum nanoparticles supported on n- and p-type gallium nitride (GaN) are investigated as novel hybrid systems for the electronic control of catalytic activity via electronic interactions with the semiconductor support. In situ oxidation and reduction were studied with high pressure photoemission spectroscopy. The experiments revealed that the underlying wide-band-gap semiconductor has a large influence on the chemical composition and oxygen affinity of supported nanoparticles under X-ray irradiation. For as-deposited Pt cuboctahedra supported on n-type GaN, a higher fraction of oxidized surface atoms was observed compared to cuboctahedral particles supported on p-type GaN. Under an oxygen atmosphere, immediate oxidation was recorded for nanoparticles on n-type GaN, whereas little oxidation was observed for nanoparticles on p-type GaN. Together, these results indicate that changes in the Pt chemical state under X-ray irradiation depend on the type of GaN doping. The strong interaction between the nanoparticles and the support is consistent with charge transfer of X-ray photogenerated free carriers at the semiconductor-nanoparticle interface and suggests that GaN is a promising wide-band-gap support material for photocatalysis and electronic control of catalysis. PMID:22738117

  7. Dielectric response of doped organic semiconductor devices: P3HT:PCBM solar cells

    NASA Astrophysics Data System (ADS)

    Armbruster, Oskar; Lungenschmied, Christoph; Bauer, Siegfried

    2011-08-01

    We introduce a model to account for the dielectric response of doped organic semiconductor devices. In addition to the phenomena observed for undoped devices, mobile charge carriers created by doping can alter the dielectric function of the organic material and hence the dielectric response of the devices. These extrinsic charges may be trapped and contribute to the capacitance on re-emission. We directly model the real part of the dielectric function based on this phenomenon. The imaginary part is obtained via the application of the Kramers-Kronig transformation. We use oxygen-doped poly(3-hexylthiophene):[6,6]-phenyl-C61-butyric acid methyl ester- (P3HT:PCBM) based organic solar cells as a model system to test our approach and hence contribute to the understanding of oxygen-induced degradation in these devices. We fit our equations to the measured dielectric data and compare it to Debye relaxation as well as two widely used equivalent circuit models. Together with the device resistance determined from the steady-state current-voltage characteristic around 0V an excellent agreement between the experimental data and our model is achieved for both the real and the imaginary part of the dielectric function over a frequency range covering five orders of magnitude. Unlike the Debye relaxation model or the equivalent circuit approach, our model yields important device parameters such as the dopant concentration.

  8. Recovering doping profiles in semiconductor devices with the Boltzmann-Poisson model

    NASA Astrophysics Data System (ADS)

    Cheng, Yingda; Gamba, Irene M.; Ren, Kui

    2011-05-01

    We investigate numerically an inverse problem related to the Boltzmann-Poisson system of equations for transport of electrons in semiconductor devices. The objective of the (ill-posed) inverse problem is to recover the doping profile of a device, presented as a source function in the mathematical model, from its current-voltage characteristics. To reduce the degree of ill-posedness of the inverse problem, we proposed to parameterize the unknown doping profile function to limit the number of unknowns in the inverse problem. We showed by numerical examples that the reconstruction of a few low moments of the doping profile is possible when relatively accurate time-dependent or time-independent measurements are available, even though the later reconstruction is less accurate than the former. We also compare reconstructions from the Boltzmann-Poisson (BP) model to those from the classical drift-diffusion-Poisson (DDP) model, assuming that measurements are generated with the BP model. We show that the two type of reconstructions can be significantly different in regimes where drift-diffusion-Poisson equation fails to model the physics accurately. However, when noise presented in measured data is high, no difference in the reconstructions can be observed.

  9. Benefitting from Dopant Loss and Ostwald Ripening in Mn Doping of II-VI Semiconductor Nanocrystals.

    PubMed

    Zhai, You; Shim, Moonsub

    2015-12-01

    Annealing or growth at high temperatures for an extended period of time is considered detrimental for most synthetic strategies for high-quality Mn-doped II-VI semiconductor nanocrystals. It can lead to the broadening of size distribution and, more importantly, to the loss of dopants. Here, we examine how ripening can be beneficial to doping in a simple "heat-up" approach, where high dopant concentrations can be achieved. We discuss the interplay of the loss of dopants, Ostwald ripening, and the clustering of Mn near the surface during nanocrystal growth. Smaller nanocrystals in a reaction batch, on average, exhibit higher undesirable band-edge photoluminescence (PL) and lower desirable dopant PL. The optimization of dopant loss and the removal of such smaller undesirable nanocrystals through Ostwald ripening along with surface exchange/passivation to remove Mn clustering lead to high Mn PL quantum yields (45 to 55 %) for ZnSxSe1-x, ZnS, CdS, and CdSxSe1-x host nanocrystals. These results provide an improved understanding of the doping process in a simple and potentially scalable synthetic strategy for achieving "pure" and bright dopant emission. PMID:26510444

  10. Benefitting from Dopant Loss and Ostwald Ripening in Mn Doping of II-VI Semiconductor Nanocrystals

    NASA Astrophysics Data System (ADS)

    Zhai, You; Shim, Moonsub

    2015-10-01

    Annealing or growth at high temperatures for an extended period of time is considered detrimental for most synthetic strategies for high-quality Mn-doped II-VI semiconductor nanocrystals. It can lead to the broadening of size distribution and, more importantly, to the loss of dopants. Here, we examine how ripening can be beneficial to doping in a simple "heat-up" approach, where high dopant concentrations can be achieved. We discuss the interplay of the loss of dopants, Ostwald ripening, and the clustering of Mn near the surface during nanocrystal growth. Smaller nanocrystals in a reaction batch, on average, exhibit higher undesirable band-edge photoluminescence (PL) and lower desirable dopant PL. The optimization of dopant loss and the removal of such smaller undesirable nanocrystals through Ostwald ripening along with surface exchange/passivation to remove Mn clustering lead to high Mn PL quantum yields (45 to 55 %) for ZnSxSe1-x, ZnS, CdS, and CdSxSe1-x host nanocrystals. These results provide an improved understanding of the doping process in a simple and potentially scalable synthetic strategy for achieving "pure" and bright dopant emission.

  11. Amorphous silicon enhanced metal-insulator-semiconductor contacts for silicon solar cells

    NASA Astrophysics Data System (ADS)

    Bullock, J.; Cuevas, A.; Yan, D.; Demaurex, B.; Hessler-Wyser, A.; De Wolf, S.

    2014-10-01

    Carrier recombination at the metal-semiconductor contacts has become a significant obstacle to the further advancement of high-efficiency diffused-junction silicon solar cells. This paper provides the proof-of-concept of a procedure to reduce contact recombination by means of enhanced metal-insulator-semiconductor (MIS) structures. Lightly diffused n+ and p+ surfaces are passivated with SiO2/a-Si:H and Al2O3/a-Si:H stacks, respectively, before the MIS contacts are formed by a thermally activated alloying process between the a-Si:H layer and an overlying aluminum film. Transmission/scanning transmission electron microscopy (TEM/STEM) and energy dispersive x-ray spectroscopy are used to ascertain the nature of the alloy. Idealized solar cell simulations reveal that MIS(n+) contacts, with SiO2 thicknesses of ˜1.55 nm, achieve the best carrier-selectivity producing a contact resistivity ρc of ˜3 mΩ cm2 and a recombination current density J0c of ˜40 fA/cm2. These characteristics are shown to be stable at temperatures up to 350 °C. The MIS(p+) contacts fail to achieve equivalent results both in terms of thermal stability and contact characteristics but may still offer advantages over directly metallized contacts in terms of manufacturing simplicity.

  12. Far tails of the density of states in amorphous organic semiconductors

    SciTech Connect

    Novikov, S. V.

    2015-10-28

    Far tails of the density of state (DOS) are calculated for the simple models of organic amorphous material, the model of dipolar glass and model of quadrupolar glass. It was found that in both models far tails are non-Gaussian. In the dipolar glass model, the DOS is symmetric around zero energy, while for the model of quadrupolar glass, the DOS is generally asymmetric and its asymmetry is directly related to the particular geometry of quadrupoles. Far tails of the DOS are relevant for the quasi-equilibrium transport of the charge carriers at low temperature. Asymmetry of DOS in quadrupolar glasses means a principal inequivalence of the random energy landscape for the transport of electrons and holes. Possible effect of the non-Gaussian shape of the far tails of the DOS on the temperature dependence of carrier drift mobility is discussed.

  13. Properties of insulator-semiconductor interfaces in amorphous silicon solar cell structures

    NASA Astrophysics Data System (ADS)

    Hasegawa, H.; Hara, T.; Arimoto, S.; Ohno, H.; Sawada, T.

    Properties of amorphous silicon surfaces passivated by anodic and plasma CVD dielectrics are investigated, using MIS structures. Detailed MIS C-V and isothermal capacitance spectroscopy (ICTS) measurements were made. In order to analyze the observed extremely complicated behavior, theoretical MIS C-V curves are calculated on the basis of a rigorous admittance analysis. Contrary to the usual assumption that interface states do not play a major role in a-Si surfaces as compared with the bulk gap states, it is shown for the first time that the electrical characteristics of interfaces are controlled predominantly by the interface states and not by the bulk gap states. Interface states have the tendency to pin the surface Fermi level at 0.4 eV from the conduction band edge.

  14. Strain-induced programmable half-metal and spin-gapless semiconductor in an edge-doped boron nitride nanoribbon

    NASA Astrophysics Data System (ADS)

    Zhu, Shuze; Li, Teng

    2016-03-01

    The search for half-metals and spin-gapless semiconductors has attracted extensive attention in material design for spintronics. Existing progress in such a search often requires peculiar atomistic lattice configuration and also lacks active control of the resulting electronic properties. Here we reveal that a boron nitride nanoribbon with a carbon-doped edge can be made a half-metal or a spin-gapless semiconductor in a programmable fashion. The mechanical strain serves as the on/off switches for functions of half-metal and spin-gapless semiconductor to occur. Our findings shed light on how the edge doping combined with strain engineering can affect electronic properties of two-dimensional materials.

  15. Enhancement ZnO nanofiber as semiconductor for dye-sensitized solar cells by using Al doped

    NASA Astrophysics Data System (ADS)

    Sutanto, Bayu; Arifin, Zainal; Suyitno, Hadi, Syamsul; Pranoto, Lia Muliani; Agustia, Yuda Virgantara

    2016-03-01

    The purpose of this research is to produce Al-doped ZnO (AZO) nanofibers in order to enhance the performance of Dye-Sensitized Solar Cell (DSSC). AZO nanofiber semiconductor was manufactured by electrospinning process of Zinc Acetate Dehydrate (Zn(CH3COO)2) solution and precursor of Polyvinyl Acetate (PVA). The doping process of Al was built by dissolving 0-4 wt% in concentrations of AlCl3 to Zinc Acetate. AZO green fiber was sintered at temperature 500°C for an hour. The result shows that Al doped ZnO had capability to increase the electrical conductivity of semiconductor for doping 0, 1, 2, 3, and 4 wt% for 2,07×10-3; 3,71×10-3; 3,59 ×10-3; 3,10 ×10-3 and 2,74 ×10-3 S/m. The best performance of DSSC with 3 cm2 active area was obtained at 1 wt% Al-ZnO which the value of VOC, ISC, FF, and efficiency were 508,43 mV, 3,125 mA, 38,76%, and 0,411% respectively. These coincide with the electrical conductivity of semiconductor and the crystal size of XRD result that has the smallest size as compared to other doping variations.

  16. P-type doping of hydrogenated amorphous silicon films with boron by reactive radio-frequency co-sputtering

    NASA Astrophysics Data System (ADS)

    Ohmura, Y.; Takahashi, M.; Suzuki, M.; Sakamoto, N.; Meguro, T.

    2001-12-01

    B has been successfully doped into the hydrogenated amorphous Si films without using explosive and/or toxic gases SiH 4 or B 2H 6 by reactive radio-frequency co-sputtering. The target used for co-sputtering was a composite target composed of a B-doped Si wafer and B chips attached on the Si wafer with silver powder bond. The maximum area fraction of B chips used was 0.11. Argon and hydrogen pressures were 5×10 -3 and 5×10 -4 Torr, respectively. Substrates were kept at 200°C or 250°C during sputtering. The maximum B concentration in the film obtained was 2×10 19 cm -3 from secondary ion mass spectroscopy measurement. Films with resistivity of 10 4-10 5 Ω cm were obtained, which was low for the above acceptor concentration, compared with other group III impurities doping, indicating the high doping efficiency of B. A heterostructure, which was prepared by co-sputtering these B-doped films on an n-type crystalline Si, shows a good rectification characteristic. A small photovoltaic effect is also observed.

  17. Amorphous silicon enhanced metal-insulator-semiconductor contacts for silicon solar cells

    SciTech Connect

    Bullock, J. Cuevas, A.; Yan, D.; Demaurex, B.; Hessler-Wyser, A.; De Wolf, S.

    2014-10-28

    Carrier recombination at the metal-semiconductor contacts has become a significant obstacle to the further advancement of high-efficiency diffused-junction silicon solar cells. This paper provides the proof-of-concept of a procedure to reduce contact recombination by means of enhanced metal-insulator-semiconductor (MIS) structures. Lightly diffused n{sup +} and p{sup +} surfaces are passivated with SiO{sub 2}/a-Si:H and Al{sub 2}O{sub 3}/a-Si:H stacks, respectively, before the MIS contacts are formed by a thermally activated alloying process between the a-Si:H layer and an overlying aluminum film. Transmission/scanning transmission electron microscopy (TEM/STEM) and energy dispersive x-ray spectroscopy are used to ascertain the nature of the alloy. Idealized solar cell simulations reveal that MIS(n{sup +}) contacts, with SiO{sub 2} thicknesses of ∼1.55 nm, achieve the best carrier-selectivity producing a contact resistivity ρ{sub c} of ∼3 mΩ cm{sup 2} and a recombination current density J{sub 0c} of ∼40 fA/cm{sup 2}. These characteristics are shown to be stable at temperatures up to 350 °C. The MIS(p{sup +}) contacts fail to achieve equivalent results both in terms of thermal stability and contact characteristics but may still offer advantages over directly metallized contacts in terms of manufacturing simplicity.

  18. Metal-semiconductor-metal UV photodetector based on Ga doped ZnO/graphene interface

    NASA Astrophysics Data System (ADS)

    Kumar, Manoj; Noh, Youngwook; Polat, Kinyas; Kemal Okyay, Ali; Lee, Dongjin

    2015-12-01

    Fabrication and characterization of metal-semiconductor-metal (MSM) ultraviolet (UV) photodetector (PD) based on Ga doped ZnO (ZnO:Ga)/graphene is presented in this work. A low dark current of 8.68 nA was demonstrated at a bias of 1 V and a large photo to dark contrast ratio of more than four orders of magnitude was observed. MSM PD exhibited a room temperature responsivity of 48.37 A/W at wavelength of 350 nm and UV-to-visible rejection ratio of about three orders of magnitude. A large photo-to-dark contrast and UV-to-visible rejection ratio suggests the enhancement in the PD performance which is attributed to the existence of a surface plasmon effect at the interface of the ZnO:Ga and underlying graphene layer.

  19. Superresolution Structure Optical Disk with Semiconductor-Doped Glass Mask Layer Containing CdSe Nanoparticles

    NASA Astrophysics Data System (ADS)

    Yeh, Tung‑Ti; Wang, Jr‑Hau; Hsieh, Tsung‑Eong; Shieh, Han‑Ping D.

    2006-02-01

    In this work, we demonstrate a distinct superresolution phenomenon and signal properties of an optical disk with a semiconductor-doped glass (SDG) mask layer containing CdSe nanoparticles. It was found that the 69 nm marks could be consistently retrieved at reading power (Pr) = 4 mW with carrier-to-noise ratio (CNR) = 13.56 dB. The signals were clearly resolved with CNRs nearly equal to 40 dB at Pr=4 mW when the recorded marks were larger than 100 nm. The cyclability test indicated that the CdSe-SiO2 SDG layer might serve as a stable and reliable optical mask layer in 105 readout cycles.

  20. Experimental verification of epsilon-near-zero plasmon polariton modes in degenerately doped semiconductor nanolayers.

    PubMed

    Campione, Salvatore; Kim, Iltai; de Ceglia, Domenico; Keeler, Gordon A; Luk, Ting S

    2016-08-01

    We investigate optical polariton modes supported by subwavelength-thick degenerately doped semiconductor nanolayers (e.g. indium tin oxide) on glass in the epsilon-near-zero (ENZ) regime. The dispersions of the radiative (R, on the left of the light line) and non-radiative (NR, on the right of the light line) ENZ polariton modes are experimentally measured and theoretically analyzed through the transfer matrix method and the complex-frequency/real-wavenumber analysis, which are in remarkable agreement. We observe directional near-perfect absorption using the Kretschmann geometry for incidence conditions close to the NR-ENZ polariton mode dispersion. Along with field enhancement, this provides us with an unexplored pathway to enhance nonlinear optical processes and to open up directions for ultrafast, tunable thermal emission. PMID:27505841

  1. Experimental verification of epsilon-near-zero plasmon polariton modes in degenerately doped semiconductor nanolayers

    DOE PAGESBeta

    Campione, Salvatore; Kim, Iltai; de Ceglia, Domenico; Keeler, Gordon A.; Luk, Ting S.

    2016-01-01

    Here, we investigate optical polariton modes supported by subwavelength-thick degenerately doped semiconductor nanolayers (e.g. indium tin oxide) on glass in the epsilon-near-zero (ENZ) regime. The dispersions of the radiative (R, on the left of the light line) and non-radiative (NR, on the right of the light line) ENZ polariton modes are experimentally measured and theoretically analyzed through the transfer matrix method and the complex-frequency/real-wavenumber analysis, which are in remarkable agreement. We observe directional near-perfect absorption using the Kretschmann geometry for incidence conditions close to the NR-ENZ polariton mode dispersion. Along with field enhancement, this provides us with an unexplored pathwaymore » to enhance nonlinear optical processes and to open up directions for ultrafast, tunable thermal emission.« less

  2. Emergence of competing magnetic interactions induced by Ge doping in the semiconductor FeGa3

    NASA Astrophysics Data System (ADS)

    Alvarez-Quiceno, J. C.; Cabrera-Baez, M.; Ribeiro, R. A.; Avila, M. A.; Dalpian, G. M.; Osorio-Guillén, J. M.

    2016-07-01

    FeGa3 is an unusual intermetallic semiconductor that presents intriguing magnetic responses to the tuning of its electronic properties. When doped with Ge, the system evolves from diamagnetic to paramagnetic to ferromagnetic ground states that are not well understood. In this work, we have performed a joint theoretical and experimental study of FeGa3 -xGex using density functional theory and magnetic susceptibility measurements. For low Ge concentrations we observe the formation of localized moments on some Fe atoms and, as the dopant concentration increases, a more delocalized magnetic behavior emerges. The magnetic configuration strongly depends on the dopant distribution, leading even to the appearance of antiferromagnetic interactions in certain configurations.

  3. Sb-doped SrTiO3 transparent semiconductor thin films

    NASA Astrophysics Data System (ADS)

    Wang, H. H.; Chen, F.; Dai, S. Y.; Zhao, T.; Lu, H. B.; Cui, D. F.; Zhou, Y. L.; Chen, Z. H.; Yang, G. Z.

    2001-03-01

    Optically transparent Sb-doped SrTiO3 thin films with a transmittance higher than 95% in most of the visible region have been grown on SrTiO3 (001) substrate by pulsed laser deposition. The films behave as an n-type semiconductor between 10 K and room temperature. The carrier concentration and mobility of the films at room temperature are ˜5.8×1017cm-3 and ˜6.4 cm2/V s, respectively. X-ray photoelectron spectroscopy measurement reveals that the delocalized electrons from the Sb dopants give rise to deep impurity levels within the band gap of the parent compound, which are responsible for the electrical conduction observed. The wide band gap and low density of states in the conduction band account for transparency of the films.

  4. Experimental verification of epsilon-near-zero plasmon polariton modes in degenerately doped semiconductor nanolayers

    SciTech Connect

    Campione, Salvatore; Kim, Iltai; de Ceglia, Domenico; Keeler, Gordon A.; Luk, Ting S.

    2016-01-01

    Here, we investigate optical polariton modes supported by subwavelength-thick degenerately doped semiconductor nanolayers (e.g. indium tin oxide) on glass in the epsilon-near-zero (ENZ) regime. The dispersions of the radiative (R, on the left of the light line) and non-radiative (NR, on the right of the light line) ENZ polariton modes are experimentally measured and theoretically analyzed through the transfer matrix method and the complex-frequency/real-wavenumber analysis, which are in remarkable agreement. We observe directional near-perfect absorption using the Kretschmann geometry for incidence conditions close to the NR-ENZ polariton mode dispersion. Along with field enhancement, this provides us with an unexplored pathway to enhance nonlinear optical processes and to open up directions for ultrafast, tunable thermal emission.

  5. Photochemical hole-burning study of 1,4-dihydroxyanthraquinone doped in amorphous silica prepared by alcoholate method

    NASA Astrophysics Data System (ADS)

    Tani, T.; Namikawa, H.; Arai, K.; Makishima, A.

    1985-11-01

    The preparation of 1,4-dihydroxyanthraquinone, an amorphous silica doped with organic dye molecules, is described. The amorphous structure of this system is studied using photochemical hole burning (PHB), and the results are reported together with absorption and fluorescence spectra measured at room temperature. The PHB results for this material are compared with those for alcoholic organic glass, and mechanisms which dominate the temperature dependence of the holewidth are discussed. The introduction of various organic molecules into inorganic oxide glasses may provide a new field in material science. These materials are promising for various optical and optoelectronic applications, including PHB memory, due to the rigidity and stability of the glassy matrices preserving the function of the organic molecules. These materials may also be highly significant for molecular electronic materials.

  6. Novel Iron-based ternary amorphous oxide semiconductor with very high transparency, electronic conductivity, and mobility

    SciTech Connect

    Malasi, A.; Taz, H.; Farah, A.; Patel, M.; Lawrie, Benjamin; Pooser, R.; Baddorf, A.; Duscher, G.; Kalyanaraman, R.

    2015-12-16

    We report that ternary metal oxides of type (Me)2O3 with the primary metal (Me) constituent being Fe (66 atomic (at.) %) along with the two Lanthanide elements Tb (10 at.%) and Dy (24 at.%) can show excellent semiconducting transport properties. Thin films prepared by pulsed laser deposition at room temperature followed by ambient oxidation showed very high electronic conductivity (>5 × 104 S/m) and Hall mobility (>30 cm2/V-s). These films had an amorphous microstructure which was stable to at least 500 °C and large optical transparency with a direct band gap of 2.85 ± 0.14 eV. This material shows emergent semiconducting behavior with significantly higher conductivity and mobility than the constituent insulating oxides. In conclusion, since these results demonstrate a new way to modify the behaviors of transition metal oxides made from unfilled d- and/or f-subshells, a new class of functional transparent conducting oxide materials could be envisioned.

  7. Novel Iron-based ternary amorphous oxide semiconductor with very high transparency, electronic conductivity, and mobility

    DOE PAGESBeta

    Malasi, A.; Taz, H.; Farah, A.; Patel, M.; Lawrie, Benjamin; Pooser, R.; Baddorf, A.; Duscher, G.; Kalyanaraman, R.

    2015-12-16

    We report that ternary metal oxides of type (Me)2O3 with the primary metal (Me) constituent being Fe (66 atomic (at.) %) along with the two Lanthanide elements Tb (10 at.%) and Dy (24 at.%) can show excellent semiconducting transport properties. Thin films prepared by pulsed laser deposition at room temperature followed by ambient oxidation showed very high electronic conductivity (>5 × 104 S/m) and Hall mobility (>30 cm2/V-s). These films had an amorphous microstructure which was stable to at least 500 °C and large optical transparency with a direct band gap of 2.85 ± 0.14 eV. This material shows emergentmore » semiconducting behavior with significantly higher conductivity and mobility than the constituent insulating oxides. In conclusion, since these results demonstrate a new way to modify the behaviors of transition metal oxides made from unfilled d- and/or f-subshells, a new class of functional transparent conducting oxide materials could be envisioned.« less

  8. Novel Iron-based ternary amorphous oxide semiconductor with very high transparency, electronic conductivity, and mobility

    PubMed Central

    Malasi, A.; Taz, H.; Farah, A.; Patel, M.; Lawrie, B.; Pooser, R.; Baddorf, A.; Duscher, G.; Kalyanaraman, R.

    2015-01-01

    Here we report that ternary metal oxides of type (Me)2O3 with the primary metal (Me) constituent being Fe (66 atomic (at.) %) along with the two Lanthanide elements Tb (10 at.%) and Dy (24 at.%) can show excellent semiconducting transport properties. Thin films prepared by pulsed laser deposition at room temperature followed by ambient oxidation showed very high electronic conductivity (>5 × 104 S/m) and Hall mobility (>30 cm2/V-s). These films had an amorphous microstructure which was stable to at least 500 °C and large optical transparency with a direct band gap of 2.85 ± 0.14 eV. This material shows emergent semiconducting behavior with significantly higher conductivity and mobility than the constituent insulating oxides. Since these results demonstrate a new way to modify the behaviors of transition metal oxides made from unfilled d- and/or f-subshells, a new class of functional transparent conducting oxide materials could be envisioned. PMID:26670421

  9. Novel Iron-based ternary amorphous oxide semiconductor with very high transparency, electronic conductivity, and mobility.

    PubMed

    Malasi, A; Taz, H; Farah, A; Patel, M; Lawrie, B; Pooser, R; Baddorf, A; Duscher, G; Kalyanaraman, R

    2015-01-01

    Here we report that ternary metal oxides of type (Me)2O3 with the primary metal (Me) constituent being Fe (66 atomic (at.) %) along with the two Lanthanide elements Tb (10 at.%) and Dy (24 at.%) can show excellent semiconducting transport properties. Thin films prepared by pulsed laser deposition at room temperature followed by ambient oxidation showed very high electronic conductivity (>5 × 10(4) S/m) and Hall mobility (>30 cm(2)/V-s). These films had an amorphous microstructure which was stable to at least 500 °C and large optical transparency with a direct band gap of 2.85 ± 0.14 eV. This material shows emergent semiconducting behavior with significantly higher conductivity and mobility than the constituent insulating oxides. Since these results demonstrate a new way to modify the behaviors of transition metal oxides made from unfilled d- and/or f-subshells, a new class of functional transparent conducting oxide materials could be envisioned. PMID:26670421

  10. Novel Iron-based ternary amorphous oxide semiconductor with very high transparency, electronic conductivity, and mobility

    NASA Astrophysics Data System (ADS)

    Malasi, A.; Taz, H.; Farah, A.; Patel, M.; Lawrie, B.; Pooser, R.; Baddorf, A.; Duscher, G.; Kalyanaraman, R.

    2015-12-01

    Here we report that ternary metal oxides of type (Me)2O3 with the primary metal (Me) constituent being Fe (66 atomic (at.) %) along with the two Lanthanide elements Tb (10 at.%) and Dy (24 at.%) can show excellent semiconducting transport properties. Thin films prepared by pulsed laser deposition at room temperature followed by ambient oxidation showed very high electronic conductivity (>5 × 104 S/m) and Hall mobility (>30 cm2/V-s). These films had an amorphous microstructure which was stable to at least 500 °C and large optical transparency with a direct band gap of 2.85 ± 0.14 eV. This material shows emergent semiconducting behavior with significantly higher conductivity and mobility than the constituent insulating oxides. Since these results demonstrate a new way to modify the behaviors of transition metal oxides made from unfilled d- and/or f-subshells, a new class of functional transparent conducting oxide materials could be envisioned.

  11. Broadband terahertz absorption enabled by coating an ultrathin antireflection film on doped semiconductor.

    PubMed

    Wu, Hongxing; Shi, Fenghua; Chen, Yihang

    2016-09-01

    We show that perfect absorption of terahertz wave can be achieved in a compact system where an ultrathin film of lossless dielectric is coated on a doped semiconductor substrate. Due to the nontrivial reflection phase shift at the interface between the two media, strong resonant behavior and the concomitant antireflection occur at wavelengths that are much larger than the thickness of the dielectric film, resulting in strong absorption of the incident wave in a wide frequency range. Using this mechanism, we design a broadband terahertz absorber by coating a Ge film on a highly doped GaAs substrate. We show that such a system not only has a perfect absorption peak, but also exhibits high absorptance (over 0.9) within a fractional bandwidth of over 20%. By varying the free carrier density in the GaAs substrate, the central frequency of the absorption band can be tuned from 1.79 to 2.69 THz. In addition, the absorption performance of the proposed system is shown to be insensitive to both incident angle and polarization. Our results offer a low-cost way for the design of absorption-based THz devices. PMID:27607670

  12. Carriers-mediated ferromagnetic enhancement in Al-doped ZnMnO dilute magnetic semiconductors

    SciTech Connect

    Saleem, Murtaza; Siddiqi, Saadat A.; Atiq, Shahid; Anwar, M. Sabieh; Hussain, Irshad; Alam, Shahzad

    2011-11-15

    Nano-crystalline Zn{sub 0.95-x}Mn{sub 0.05}Al{sub x}O (x = 0, 0.05, 0.10) dilute magnetic semiconductors (DMS) were synthesized by sol-gel derived auto-combustion. X-ray diffraction (XRD) analysis shows that the samples have pure wurtzite structure typical of ZnO without the formation of secondary phases or impurity. Crystallite sizes were approximated by Scherrer formula while surface morphology and grain sizes were measured by field emission scanning electron microscopy. Incorporation of Mn and Al into the ZnO structure was confirmed by energy-dispersive X-ray analysis. Temperature dependent electrical resistivity measurements showed a decreasing trend with the doping of Al in ZnMnO, which is attributable to the enhancement of free carriers. Vibrating sample magnetometer studies confirmed the presence of ferromagnetic behavior at room temperature. The results indicate that Al doping results in significant variation in the concentration of free carriers and correspondingly the carrier-mediated magnetization and room temperature ferromagnetic behavior, showing promise for practical applications. We attribute the enhanced saturation magnetization and electrical conductivity to the exchange interaction mediated by free electrons.

  13. A multi-scale approach to the electronic structure of doped semiconductor surfaces

    NASA Astrophysics Data System (ADS)

    Sinai, Ofer; Hofmann, Oliver T.; Rinke, Patrick; Scheffler, Matthias; Heimel, Georg; Kronik, Leeor

    2015-03-01

    The inclusion of the global effects of semiconductor doping poses a unique challenge for first-principles simulations, because the typically low concentration of dopants renders an explicit treatment intractable. Furthermore, the width of the space-charge region (SCR) at charged surfaces often exceeds realistic supercell dimensions. We present a multi-scale technique that addresses these difficulties. It is based on the introduction of excess charge, mimicking free charge carriers from the SCR, along with a fixed sheet of counter-charge mimicking the SCR-related field. Self-consistency is obtained by imposing charge conservation and Fermi level equilibration between the bulk, treated semi-classically, and the electronic states of the slab/surface, which are treated quantum-mechanically. The method, called CREST - the Charge-Reservoir Electrostatic Sheet Technique - can be used with standard electronic structure codes. We validate CREST using a simple tight-binding model, which allows for comparison of its results with calculations encompassing the full SCR explicitly. We then employ it with density functional theory, obtaining insight into the doping dependence of the electronic structures of the metallic clean-cleaved Si(111) surface and its semiconducting (2x1) reconstructions.

  14. Investigating the thermal stability of electron transport properties in modulation-doped semiconductor heterostructure systems

    NASA Astrophysics Data System (ADS)

    Pilgrim, Ian; Scannell, Billy; See, Andrew; Montgomery, Rick; Morse, Peter; Fairbanks, Matt; Marlow, Colleen; Linke, Heiner; Farrer, Ian; Ritchie, David; Hamilton, Alex; Micolich, Adam; Eaves, Laurence; Taylor, Richard

    2013-03-01

    Since the 1950s, materials scientists have pursued the fabrication of solid-state heterostructure (HS) devices of sufficient purity to replicate electron interference effects originally observed in vacuum. The ultimate goal of HS engineering is to create a semiconductor ``billiard table'' in which electrons travel ballistically in a 2-D plane--that is, with scattering events minimized such that the electron's mean free path exceeds the device size. For the past two decades, the modulation-doped (MD) HS architecture has yielded devices supporting very high electron mobilities. In this architecture, ionized dopants are spatially removed from the plane of the electrons, such that their influence on electron trajectories is felt through presumably negligible small-angle scattering events. However, we observe that thermally induced charge redistribution in the doped layers of AlGaAs/GaAs and GaInAs/InP MD heterostructures significantly alters electron transport dynamics as measured by magnetoconductance fluctuations. This result demonstrates that small-angle scattering plays a far larger role than expected in influencing conduction properties. Funded by the Office of Naval Research, US Air Force, Australian Research Council, and Research Corporation for Science Advancement

  15. Features of conduction mechanisms in n-HfNiSn semiconductor heavily doped with a Rh acceptor impurity

    SciTech Connect

    Romaka, V. A.; Rogl, P.; Stadnyk, Yu. V.; Romaka, V. V.; Hlil, E. K.; Krajovskii, V. Ya.; Horyn, A. M.

    2013-09-15

    The crystal structure and electron-density distribution, as well as the energy, kinetic, and magnetic characteristics of n-HfNiSn intermetallic semiconductor heavily doped with a Rh acceptor impurity in the temperature range T = 80-400 K, in the acceptor-concentration range N{sub A}{sup Rh} Almost-Equal-To 9.5 Multiplication-Sign 10{sup 19}-1.9 Multiplication-Sign 10{sup 21} cm{sup -3} (x = 0.005-0.10), and in magnetic fields H {<=} 10 kG are investigated. It is established that doping is accompanied by a simultaneous decrease in concentration, the elimination of donor-type structural defects (to x Almost-Equal-To 0.02), and an increase in the concentration of acceptor-type structural defects (0 < x {<=} 0.10). The dependence of the degree of semiconductor compensation on temperature is revealed. A model of the spatial arrangement of atoms in HfNi{sub 1-x}Rh{sub x}Sn is proposed, and the results of calculating the electron structure based on this model agree with the results of investigations of the kinetic and magnetic characteristics of the semiconductor. The results are discussed within the context of the Shklovskii-Efros model for a heavily doped and compensated semiconductor.

  16. Determination of active doping in highly resistive boron doped silicon nanocrystals embedded in SiO2 by capacitance voltage measurement on inverted metal oxide semiconductor structure

    NASA Astrophysics Data System (ADS)

    Zhang, Tian; Puthen-Veettil, Binesh; Wu, Lingfeng; Jia, Xuguang; Lin, Ziyun; Yang, Terry Chien-Jen; Conibeer, Gavin; Perez-Wurfl, Ivan

    2015-10-01

    We investigate the Capacitance-Voltage (CV) measurement to study the electrically active boron doping in Si nanocrystals (ncSi) embedded in SiO2. The ncSi thin films with high resistivity (200-400 Ω cm) can be measured by using an inverted metal oxide semiconductor (MOS) structure (Al/ncSi (B)/SiO2/Si). This device structure eliminates the complications from the effects of lateral current flow and the high sheet resistance in standard lateral MOS structures. The characteristic MOS CV curves observed are consistent with the effective p-type doping. The CV modeling method is presented and used to evaluate the electrically active doping concentration. We find that the highly boron doped ncSi films have electrically active doping of 1018-1019 cm-3 despite their high resistivity. The saturation of doping at about 1.4 × 1019 cm-3 and the low doping efficiency less than 5% are observed and discussed. The calculated effective mobility is in the order of 10-3 cm2/V s, indicating strong impurity/defect scattering effect that hinders carriers transport.

  17. Determination of active doping in highly resistive boron doped silicon nanocrystals embedded in SiO{sub 2} by capacitance voltage measurement on inverted metal oxide semiconductor structure

    SciTech Connect

    Zhang, Tian Puthen-Veettil, Binesh; Wu, Lingfeng; Jia, Xuguang; Lin, Ziyun; Yang, Terry Chien-Jen; Conibeer, Gavin; Perez-Wurfl, Ivan

    2015-10-21

    We investigate the Capacitance-Voltage (CV) measurement to study the electrically active boron doping in Si nanocrystals (ncSi) embedded in SiO{sub 2}. The ncSi thin films with high resistivity (200–400 Ω cm) can be measured by using an inverted metal oxide semiconductor (MOS) structure (Al/ncSi (B)/SiO{sub 2}/Si). This device structure eliminates the complications from the effects of lateral current flow and the high sheet resistance in standard lateral MOS structures. The characteristic MOS CV curves observed are consistent with the effective p-type doping. The CV modeling method is presented and used to evaluate the electrically active doping concentration. We find that the highly boron doped ncSi films have electrically active doping of 10{sup 18}–10{sup 19 }cm{sup −3} despite their high resistivity. The saturation of doping at about 1.4 × 10{sup 19 }cm{sup −3} and the low doping efficiency less than 5% are observed and discussed. The calculated effective mobility is in the order of 10{sup −3} cm{sup 2}/V s, indicating strong impurity/defect scattering effect that hinders carriers transport.

  18. Tellurium n-type doping of highly mismatched amorphous GaN1-xAsx alloys in plasma-assisted molecular beam epitaxy

    DOE PAGESBeta

    Novikov, S. V.; Ting, M.; Yu, K. M.; Sarney, W. L.; Martin, R. W.; Svensson, S. P.; Walukiewicz, W.; Foxon, C. T.

    2014-10-01

    In this paper we report our study on n-type Te doping of amorphous GaN1-xAsx layers grown by plasma-assisted molecular beam epitaxy. We have used a low temperature PbTe source as a source of tellurium. Reproducible and uniform tellurium incorporation in amorphous GaN1-xAsx layers has been successfully achieved with a maximum Te concentration of 9×10²⁰ cm⁻³. Tellurium incorporation resulted in n-doping of GaN1-xAsx layers with Hall carrier concentrations up to 3×10¹⁹ cm⁻³ and mobilities of ~1 cm²/V s. The optimal growth temperature window for efficient Te doping of the amorphous GaN1-xAsx layers has been determined.

  19. Tellurium n-type doping of highly mismatched amorphous GaN1-xAsx alloys in plasma-assisted molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Novikov, S. V.; Ting, M.; Yu, K. M.; Sarney, W. L.; Martin, R. W.; Svensson, S. P.; Walukiewicz, W.; Foxon, C. T.

    2014-10-01

    In this paper we report our study on n-type Te doping of amorphous GaN1-xAsx layers grown by plasma-assisted molecular beam epitaxy. We have used a low temperature PbTe source as a source of tellurium. Reproducible and uniform tellurium incorporation in amorphous GaN1-xAsx layers has been successfully achieved with a maximum Te concentration of 9×1020 cm-3. Tellurium incorporation resulted in n-doping of GaN1-xAsx layers with Hall carrier concentrations up to 3×1019 cm-3 and mobilities of ~1 cm2/V s. The optimal growth temperature window for efficient Te doping of the amorphous GaN1-xAsx layers has been determined.

  20. Amorphous flower-like molybdenum-sulfide-@-nitrogen-doped-carbon-nanofiber film for use in the hydrogen-evolution reaction.

    PubMed

    Zhang, Xiaoyan; Li, Libo; Guo, Yaxiao; Liu, Dong; You, Tianyan

    2016-06-15

    A novel amorphous flower-like molybdenum sulfides@nitrogen doped carbon nanofibers (MoSx@NCNFs) films are successfully synthesized by combining electrospinning, carbonization and a mild hydrothermal process. NCNFs, as a conductive substrate, can accelerate the electron transfer rate and depress the aggregation of MoSx nanoparticles. The resultant amorphous flower-like MoSx on NCNFs exposes abundant S(2-)/S2(2-) active edge sites which is of great importance for hydrogen evolution reaction (HER) catalytic performance. Electrochemical measurements demonstrate the superior electrocatalytic activity of MoSx@NCNFs toward HER deriving from the synergistic effect between NCNFs and amorphous MoSx. The overpotential is only 137 mV to reach the current density of 10 mA cm(-2) with a Tafel slope of 41 mV decade(-1) at MoSx@NCNFs. Meanwhile, MoSx@NCNFs exhibits satisfactory long-time stability for HER. Noteworthy, the obtained composites show a free-standing structure which can be directly used as electrode materials. This work provides a feasible way to design promising noble-metal free electrocatalysts in the aspect of energy conversion. PMID:27015391

  1. Enhanced separation efficiency of photoinduced charges for antimony-doped tin oxide (Sb-SnO2)/TiO2 heterojunction semiconductors with varied Sb doping concentration

    NASA Astrophysics Data System (ADS)

    Zhang, Zhen-Long; Ma, Wen-Hai; Mao, Yan-Li

    2014-09-01

    In this paper, antimony-doped tin oxide (Sb-SnO2) nanoparticles were synthesized with varied Sb doping concentration, and the Sb-SnO2/TiO2 heterojunction semiconductors were prepared with Sb-SnO2 and TiO2. The separation efficiency of photoinduced charges was characterized with surface photovoltage (SPV) technique. Compared with Sb-SnO2 and TiO2, Sb-SnO2/TiO2 presents an enhanced separation efficiency of photoinduced charges, and the SPV enhancements were estimated to be 1.40, 1.43, and 1.99 for Sb-SnO2/TiO2 composed of Sb-SnO2 with the Sb doping concentration of 5%, 10%, and 15%, respectively. To understand the enhancement, the band structure of Sb-SnO2 and TiO2 in the heterojunction semiconductor was determined, and the conduction band offsets (CBO) between Sb-SnO2 and TiO2 were estimated to be 0.56, 0.64, and 0.98 eV for Sb-SnO2/TiO2 composed of Sb-SnO2 with the Sb doping concentration of 5%, 10%, and 15%, respectively. These results indicate that the separation efficiency enhancement is resulting from the energy level matching, and the increase of enhancement is due to the rising of CBO.

  2. Direct laser writing of topographic features in semiconductor-doped glass

    NASA Astrophysics Data System (ADS)

    Smuk, Andrei Y.

    2000-11-01

    Patterning of glass and silica surfaces is important for a number of modern technologies, which depend on these materials for manufacturing of both final products, such as optics, and prototypes for casting and molding. Among the fields that require glass processing on microscopic scale are optics (lenses and arrays, diffractive/holographic elements, waveguides), biotechnology (capillary electrophoresis chips and biochemical libraries) and magnetic media (landing zones for magnetic heads). Currently, standard non-laser techniques for glass surface patterning require complex multi-step processes, such as photolithography. Work carried out at Brown has shown that semiconductor- doped glasses (SDG) allow a single-step patterning process using low power continuous-wave visible lasers. SDG are composite materials, which consist of semiconductor crystallites embedded into glass matrix. In this study, borosilicate glasses doped with CdSxSe1-x nanocrystals were used. Exposure of these materials to a low-power above- the-energy gap laser beam leads to local softening, and subsequent expansion and rapid solidification of the exposed volume, resulting in a nearly spherical topographic feature on the surface. The effects of the incident power, beam configuration, and the exposure time on the formation and final parameters of the microlens were studied. Based on the numerical simulation of the temperature distribution produced by the absorbed Gaussian beam, and the ideas of viscous flow at the temperatures around the glass transition point, a model of lens formation is suggested. The light intensity distribution in the near-field of the growing lens is shown to have a significant effect on the final lens height. Fabrication of dense arrays of microlenses is shown, and the thermal and structural interactions between the neighboring lenses were also studied. Two-dimensional continuous-profile topographic features are achieved by exposure of the moving substrates to the writing

  3. Electrostatic analysis of n-doped SrTiO{sub 3} metal-insulator-semiconductor systems

    SciTech Connect

    Kamerbeek, A. M. Banerjee, T.; Hueting, R. J. E.

    2015-12-14

    Electron doped SrTiO{sub 3}, a complex-oxide semiconductor, possesses novel electronic properties due to its strong temperature and electric-field dependent permittivity. Due to the high permittivity, metal/n-SrTiO{sub 3} systems show reasonably strong rectification even when SrTiO{sub 3} is degenerately doped. Our experiments show that the insertion of a sub nanometer layer of AlO{sub x} in between the metal and n-SrTiO{sub 3} interface leads to a dramatic reduction of the Schottky barrier height (from around 0.90 V to 0.25 V). This reduces the interface resistivity by 4 orders of magnitude. The derived electrostatic analysis of the metal-insulator-semiconductor (n-SrTiO{sub 3}) system is consistent with this trend. When compared with a Si based MIS system, the change is much larger and mainly governed by the high permittivity of SrTiO{sub 3}. The non-linear permittivity of n-SrTiO{sub 3} leads to unconventional properties such as a temperature dependent surface potential non-existent for semiconductors with linear permittivity such as Si. This allows tuning of the interfacial band alignment, and consequently the Schottky barrier height, in a much more drastic way than in conventional semiconductors.

  4. Low Temperature Cathodoluminescence Spectroscopy of Amorphous Aluminum Nitride Nanoparticles doped with Erbium, synthesized using Inert Gas Condensation Technique

    NASA Astrophysics Data System (ADS)

    Pandya, Sneha; Wang, Jingzhou; Wojciech, Jadwisienczak; Kordesch, Martin

    2015-03-01

    Free standing Aluminum Nitride Nanoparticles (NPs) doped in situwith Erbium (AlN:Er), ranging from 3-30nm in size, were synthesized using a vapor phase deposition technique known as Inert Gas Condensation (IGC). Amorphous behavior of these NPs was inferred from the wide-angle X-ray spectroscopy studies. Raman spectra analysis for these AlN:Er NPs showed characteristic peaks for A1(TO) and E2(high) phonon modes of AlN. Detailed structural characterization of these Er doped AlN NPs will be carried out using a High-Resolution TEM, results of which will be included in my talk. Low temperature Cathodoluminescence (CL) measurements were carried out for these a-AlN:Er NPs. The corresponding Er+3 ion emission peaks were compared to the CL emission spectra obtained for a-AlN:Er thin films, and for commercially obtained Erbium-Oxide NPs. These spectroscopic results will be discussed in detail. I will also present the CL results obtained for in-air and in-nitrogen atmosphere annealed a-AlN:Er NPs. In addition to this, I will illustrate how these Er doped NPs can be used as nano-scale temperature sensors. The SNOM help provided by Prof. Hugh Richardson is gratefully acknowledged.

  5. Silicon-doping makes the B12N12 insulator to an n or p-semiconductor

    NASA Astrophysics Data System (ADS)

    Baei, Mohammad T.; Hashemian, Saeedeh; Yourdkhani, Sirous

    2013-08-01

    Density functional theory (DFT) calculations were performed to investigate the electronic and structural properties of pristine and Si-doped B12N12 fullerene in SiB and SiN models in order to evaluate the influence of Si doping on B12N12 fullerene. The optimized structures, structural parameters, dipole moments, binding energies, energy gaps, Fermi level energies (EFL), work function (Φ), and chemical shifts have been evaluated for the pristine and two Si-doped B12N12 fullerene structures. It was found that the values of energy gap and work function of the SiB and SiN models are decreased, so that the B12N12 insulator converts to an n or p-semiconductor in the SiB and SiN models. Also, a better value of binding energy was obtained for the SiB model in comparison with the SiN model. The evaluation of chemical shifts indicated that the doped Si atom significantly influence on the chemical shifts of the B12N12 fullerene, especially in the SiN model. The doped Si atom could employ an electric field on the B and N atoms of Si-doped B12N12 structures, so that their chemical shifts go to lower fields.

  6. Radiative recombination model of degenerate semiconductor and photoluminescence properties of 3C-SiC by P and N doping

    NASA Astrophysics Data System (ADS)

    Wang, Kun; Fang, Xiao-Yong; Li, Ya-Qin; Yin, Ai-Cha; Jin, Hai-Bo; Yuan, Jie; Cao, Mao-Sheng

    2012-08-01

    Based on radiative recombination theory, we have established a recombination model that can be used to calculate photoluminescence (PL) intensity for degenerate semiconductors. Using this model and density functional theory, we calculated photoluminescence excitation (PLE) and PL spectra of intrinsic 3C-SiC, P-doped SiC and N-doped SiC. The violet or near ultraviolet PLE peaks were found to be observed in PLE spectra for Sin-1PCn and SinNCn-1 (n = 4, 8, 12, and 16). Compared to intrinsic 3C-SiC, doped 3C-SiC exhibits higher PL peaks which for P-doped SiC are in the indigo spectral region, near the 3C-SiC's peak, and for N-doped SiC appear in the green. The phenomena are studied through analyses of band structure, carrier concentration, and absorption. For doped 3C-SiC, the PL properties are mainly improved by the band-gap transformation from indirect to direct and the increase in carrier concentration near the Fermi level.

  7. Magnetic properties of first-row element-doped ZnS semiconductors: A density functional theory investigation

    NASA Astrophysics Data System (ADS)

    Long, Run; English, Niall J.

    2009-09-01

    Based on first-principles calculations, we have investigated the magnetic properties of the first-row element-doped ZnS semiconductors. Calculations reveal that Be, B, and C dopants can induce magnetism while N cannot lead to spin polarization in ZnS. A possible explanation has been rationalized from the elements’ electronegativity and interaction between dopant and host atoms. The total magnetic moments are 2.00, 3.16, and 2.38μB per 2×2×2 supercell for Be, B, and C doping, respectively, and ferromagnetic coupling is generally observed in these cases. The ferromagnetism of Be-, B-, and C-doped ZnS can be explained by hole-mediated s-p or p-p interactions’ coupling mechanisms. The clustering effect was found to be present in Be-, B-, and C-doped ZnS but the degree is more obvious in the former two cases than in the latter case. Analysis revealed that C-doped ZnS displays better potential ferromagnetic behavior than Be- and B-doped ZnS due to its semimetallic characteristics.

  8. Block Copolymer Directed Self-Assembly Approaches for Doping Planar and Non-Planar Semiconductors

    NASA Astrophysics Data System (ADS)

    Popere, Bhooshan; Russ, Boris; Heitsch, Andrew; Trefonas, Peter; Segalman, Rachel

    As electronic circuits continue to shrink, reliable nanoscale doping of functional devices presents new challenges. While directed self-assembly (DSA) of block copolymers (BCPs) has enabled excellent pitch control for lithography, controlling the 3D dopant distribution remains a fundamental challenge. To this end, we have developed a BCP self-assembly approach to confine dopants to nanoscopic domains within a semiconductor. This relies on the supramolecular encapsulation of the dopants within the core of the block copolymer (PS- b-P4VP) micelles, self-assembly of these micelles on the substrate, followed by rapid thermal diffusion of the dopants into the underlying substrate. We show that the periodic nature of the BCP domains enables precise control over the dosage and spatial position of dopant atoms on the technologically relevant length scales (10-100 nm). Additionally, as the lateral density of 2D circuit elements approaches the Moore's limit, novel 3D architectures have emerged. We have utilized our BCP self-assembly approach towards understanding the self-assembly our micelles directed by such nanoscale non-planar features. We show that the geometric confinement imposed by the hard feature walls directs the assembly of these micelles.

  9. Solubility control in dilute magnetic semiconductors by using the co-doping method

    NASA Astrophysics Data System (ADS)

    Sato, Kazunori; Fujii, Hitoshi; Bergqvist, Lars; Dederichs, Peter H.; Katayama-Yoshida, Hiroshi

    2009-03-01

    To overcome low solubility limit of magnetic impurities in dilute magnetic semiconductors (DMS) and realize room temperature ferromagnetism, we propose a co-doping method to increase solubility of magnetic impurities in DMS [1]. We calculate electronic structure of (Ga, Mn)As, (Ga, Mn)N, (Ga, Cr)N and (Zn, Cr)Te with interstitial impurities, such as Li, Na and Cu, from first-principles by using the Korringa-Kohn- Rostoker coherent potential approximation (KKR-CPA) method. From the total energy results, it is shown that the mixing energy of magnetic impurity becomes negative and the solubility of magnetic impurities is strongly enhanced under the existence of interstitials [1]. In general, the co-dopants compensate hole carriers, thus the system becomes paramagnetic. However, owing to the large diffusivity of these interstitial impurities, we can anneal out the co-dopants after the crystal growth to recover the ferromagnetism. As an example, kinetic Monte Carlo simulations for the diffusion of interstitial co-dopants in DMS will be shown. [1] K. Sato et al., Jpn. J. Appl. Phys. 46 L1120 (2007)

  10. Study of the new diluted magnetic semiconductors based on the doping of iron-based superconductors

    NASA Astrophysics Data System (ADS)

    Zhang, Li; Feng, Shan; Li, Linxian; Wang, Shaolei; Li, Yuke

    Diluted magnetic semiconductors(DMSs) have attracted increasing attention because of their potential applications in spintronics. Recently, a series of new bulk DMS materialswere synthesized by doping in the 122 and 1111 phases of iron-based superconductors(Fe-SC), which sheds light on the DMS research[3]. In this report, we have synthesized two systems of 1111 phases of DMSs based on Fe-SC materials (La1-xSrx) (Ag0.925 Mn0.075) SO(x =0, 0.025, 0.05, 0.075 and 0.1) and (Y1-xSrx) (Cu0.925 Mn0.075) SO (x =0, 0.025, 0.05,0.075 and 0.1) by solid state method. The structure and electrical, magnetic and optical properties have been investigated by means of XRD, 4KCCS, MPMS, PL, UV-Vis and Raman technique, respectively. Some interesting phenomena are found (Such as the Curie temperature Tc and band-gap energy Eg change regularly with the dopants additon). The results are helpful to clarify the intrinsic mechanism of the DMSs, and will provide new insights on the fabrication and application of devices based on these materials. This work was supported by the National Science Foundation of China (Grant No 61376094). Li Zhang would like to acknowledge a scholarship Granted by China Scholarship Council (CSC-201408330028)