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Sample records for antireflection coated s-fap

  1. Laser damage initiation and growth of antireflection coated S-FAP crystal surfaces prepared by pitch lap and magnetorheological finishing

    SciTech Connect

    Stolz, C J; Menapace, J A; Schaffers, K I; Bibeau, C; Thomas, M D; Griffin, A J

    2005-10-31

    Antireflection (AR) coatings typically damage at the interface between the substrate and coating. Therefore the substrate finishing technology can have an impact on the laser resistance of the coating. For this study, AR coatings were deposited on Yb:S-FAP [Yb{sup 3+}:Sr{sub 5}(PO{sub 4}){sub 3}F] crystals that received a final polish by both conventional pitch lap finishing as well as magnetorheological finishing (MRF). SEM images of the damage morphology reveals laser damage originates at scratches and at substrate coating interfacial absorbing defects. Previous damage stability tests on multilayer mirror coatings and bare surfaces revealed damage growth can occur at fluences below the initiation fluence. The results from this study suggest the opposite trend for AR coatings. Investigation of unstable HR and uncoated surface damage morphologies reveals significant radial cracking that is not apparent with AR damage due to AR delamination from the coated surface with few apparent cracks at the damage boundary. Damage stability tests show that coated Yb:S-FAP crystals can operate at 1057 nm at fluences around 20 J/cm{sup 2} at 10 ns; almost twice the initiation damage threshold.

  2. Metasurface optical antireflection coating

    SciTech Connect

    Zhang, Boyang; Hendrickson, Joshua; Nader, Nima; Chen, Hou -Tong; Guo, Junpeng

    2014-12-15

    Light reflection at the boundary of two different media is one of the fundamental phenomena in optics, and reduction of reflection is highly desirable in many optical systems. Traditionally, optical antireflection has been accomplished using single- or multiple-layer dielectric films and graded index surface structures in various wavelength ranges. However, these approaches either impose strict requirements on the refractive index matching and film thickness, or involve complicated fabrication processes and non-planar surfaces that are challenging for device integration. Here, we demonstrate an antireflection coating strategy, both experimentally and numerically, by using metasurfaces with designer optical properties in the mid-wave infrared. Our results show that the metasurface antireflection is capable of eliminating reflection and enhancing transmission over a broad spectral band and a wide incidence angle range. The demonstrated antireflection technique has no requirement on the choice of materials and is scalable to other wavelengths.

  3. Metasurface optical antireflection coating

    DOE PAGESBeta

    Zhang, Boyang; Hendrickson, Joshua; Nader, Nima; Chen, Hou -Tong; Guo, Junpeng

    2014-12-15

    Light reflection at the boundary of two different media is one of the fundamental phenomena in optics, and reduction of reflection is highly desirable in many optical systems. Traditionally, optical antireflection has been accomplished using single- or multiple-layer dielectric films and graded index surface structures in various wavelength ranges. However, these approaches either impose strict requirements on the refractive index matching and film thickness, or involve complicated fabrication processes and non-planar surfaces that are challenging for device integration. Here, we demonstrate an antireflection coating strategy, both experimentally and numerically, by using metasurfaces with designer optical properties in the mid-wave infrared.more » Our results show that the metasurface antireflection is capable of eliminating reflection and enhancing transmission over a broad spectral band and a wide incidence angle range. The demonstrated antireflection technique has no requirement on the choice of materials and is scalable to other wavelengths.« less

  4. Compound semiconductor oxide antireflection coatings

    NASA Astrophysics Data System (ADS)

    Knopp, K. J.; Mirin, R. P.; Bertness, K. A.; Silverman, K. L.; Christensen, D. H.

    2000-05-01

    We report the development of high quality, broad-bandwidth, antireflection (AR) coatings using the low index provided by wet thermally oxidized Al0.98Ga0.02As. We address the design criteria, fabrication, and characterizations of AR coatings composed of surface and buried oxide layers on GaAs. We show, using native-oxide dispersion data, that surface oxide coatings can be designed to offer a nearly zero minimum of reflectance and a reflectance of <1% over bandwidths as large as 500 nm. Surface coatings having a reflectance minimum of 0.4% and a reflectance of <1% over >250 nm have been experimentally demonstrated at a design wavelength of 1 micrometer. Additionally, buried oxide coatings can be designed with an AlxGa1-xAs matching layer of any composition to exactly match the admittance of any substrate with effective index between 2.5 and 3.5. We have demonstrated buried oxide coatings, also designed for 1 micrometer, having a reflectance minimum of 0.4% and a reflectance of <1% over 21 nm. The calculated optical scattering loss from measured roughness data indicates that reflectance minima as low as 10-4 % are ultimately achievable with native-oxide antireflection coatings.

  5. Yb:S-FAP Lasers

    SciTech Connect

    Schaffers, K I

    2004-01-20

    It has recently been reported that several high power, diode-pumped laser systems have been developed based on crystals of Yb:S-FAP [Yb{sup 3+}:Sr{sub 5}(PO{sub 4}){sub 3}F]. The Mercury Laser, at Lawrence Livermore National Laboratory, is the most prominent system using Yb:S-FAP and is currently producing 23J at 5 Hz in a 15 nsec pulse, based on partial activation of the system. In addition, a regenerative amplifier is being developed at Waseda University in Japan and has produced greater than 12 mJ with high beam quality at 50Hz repetition rate. Q-peak has demonstrated 16 mJ of maximum energy/output pulse in a multi-pass, diode side-pumped amplifier and ELSA in France is implementing Yb:S-FAP in a 985 nm pump for an EDFA, producing 250 mW. Growth of high optical quality crystals of Yb:S-FAP is a challenge due to multiple crystalline defects. However, at this time, a growth process has been developed to produce high quality 3.5 cm diameter Yb:S-FAP crystals and a process is under development for producing 6.5 cm diameter crystals.

  6. Loss/gain-induced ultrathin antireflection coatings

    PubMed Central

    Luo, Jie; Li, Sucheng; Hou, Bo; Lai, Yun

    2016-01-01

    Tradional antireflection coatings composed of dielectric layers usually require the thickness to be larger than quarter wavelength. Here, we demonstrate that materials with permittivity or permeability dominated by imaginary parts, i.e. lossy or gain media, can realize non-resonant antireflection coatings in deep sub-wavelength scale. Interestingly, while the reflected waves are eliminated as in traditional dielectric antireflection coatings, the transmitted waves can be enhanced or reduced, depending on whether gain or lossy media are applied, respectively. We provide a unified theory for the design of such ultrathin antireflection coatings, showing that under different polarizations and incident angles, different types of ultrathin coatings should be applied. Especially, under transverse magnetic polarization, the requirement shows a switch between gain and lossy media at Brewster angle. As a proof of principle, by using conductive films as a special type of lossy antireflection coatings, we experimentally demonstrate the suppression of Fabry-Pérot resonances in a broad frequency range for microwaves. This valuable functionality can be applied to remove undesired resonant effects, such as the frequency-dependent side lobes induced by resonances in dielectric coverings of antennas. Our work provides a guide for the design of ultrathin antireflection coatings as well as their applications in broadband reflectionless devices. PMID:27349750

  7. Loss/gain-induced ultrathin antireflection coatings.

    PubMed

    Luo, Jie; Li, Sucheng; Hou, Bo; Lai, Yun

    2016-01-01

    Tradional antireflection coatings composed of dielectric layers usually require the thickness to be larger than quarter wavelength. Here, we demonstrate that materials with permittivity or permeability dominated by imaginary parts, i.e. lossy or gain media, can realize non-resonant antireflection coatings in deep sub-wavelength scale. Interestingly, while the reflected waves are eliminated as in traditional dielectric antireflection coatings, the transmitted waves can be enhanced or reduced, depending on whether gain or lossy media are applied, respectively. We provide a unified theory for the design of such ultrathin antireflection coatings, showing that under different polarizations and incident angles, different types of ultrathin coatings should be applied. Especially, under transverse magnetic polarization, the requirement shows a switch between gain and lossy media at Brewster angle. As a proof of principle, by using conductive films as a special type of lossy antireflection coatings, we experimentally demonstrate the suppression of Fabry-Pérot resonances in a broad frequency range for microwaves. This valuable functionality can be applied to remove undesired resonant effects, such as the frequency-dependent side lobes induced by resonances in dielectric coverings of antennas. Our work provides a guide for the design of ultrathin antireflection coatings as well as their applications in broadband reflectionless devices. PMID:27349750

  8. Sol-gel antireflective coating on plastics

    DOEpatents

    Ashley, C.S.; Reed, S.T.

    1988-01-26

    An antireflection film made from reliquified sol-gel hydrolyzation, condensation polymeric reaction product of a silicon, alkoxides and/or metal alkoxides, or mixtures thereof. The film is particularly useful for coating plastics.

  9. Sol-gel antireflective coating on plastics

    DOEpatents

    Ashley, Carol S.; Reed, Scott T.

    1990-01-01

    An antireflection film made from a reliquified sol-gel hydrolyzation, condensation polymeric reaction product of a silicon, alkoxides and/or metal alkoxides, or mixtures thereof. The film is particularly useful for coating plastics.

  10. Nanostructural antireflecting coatings: Classification analysis (A review)

    NASA Astrophysics Data System (ADS)

    Baryshnikova, K. V.; Kadochkin, A. S.; Shalin, A. S.

    2015-09-01

    Many modern optical instruments require the use of high-quality antireflecting coatings. Singleand multilayer homogeneous films are mainly used for this purpose. However, an alternative line is rapidly developed at present, which is devoted to the design and use of nanostructural systems for increasing the transparency of different media. Despite the unified principle of operation of these coatings, which is based on the destructive interference of waves in the direction of reflection of light, approaches to their implementation may differ significantly. Different types of nanostructural coatings are considered in detail and classified, their optical properties are compared, and special attention is paid to methods of their manufacture. It is shown that different antireflecting coatings should be used for different purposes, and that coatings that combine properties of several classes often have better antireflecting capabilities.

  11. Broadband antireflection coatings for multifunctional avionic displays

    NASA Astrophysics Data System (ADS)

    Kumari, Neelam; Kumar, Mukesh; Rao, P. K.; Karar, Vinod; Sharma, Amit Lochan

    2015-06-01

    Broadband Multilayer Antireflection (AR) coatings markedly improve the transmission efficiency of any optical component such as lens, prism, beam-splitter, beam combiner or a window. By reducing surface reflections over a wide wavelength range, broadband antireflection coatings improve transmission and enhance contrast which is desired in avionic displays. The broadband antireflection coating consisting of MgF2, ZrO2 and Al2O3 were designed to cover the whole visible spectrum and fabricated on optical grade glass substrate. The optical characterization of these coatings indicates reduction of the reflection to 2.28% as compared to 8.5 % at 545 nm (i.e. design wavelength of most avionic displays) for bare substrate making them useful in optical displays for avionic applications.

  12. Antireflection coating for high index cemented doublets.

    PubMed

    Willey, R R

    1990-11-01

    Uncoated surfaces of high index glasses when cemented to form lens doublets have inferior antireflection properties to doublets of low index glass. This can be overcome by the application of a single layer coating of aluminum oxide prior to cementing. PMID:20577426

  13. Generalized antireflection coatings for complex bulk metamaterials

    NASA Astrophysics Data System (ADS)

    Maas, Ruben; Mann, Sander A.; Sounas, Dimitrios L.; Alù, Andrea; Garnett, Erik C.; Polman, Albert

    2016-05-01

    We present the optimized design of an antireflection coating to efficiently couple an incident plane wave into a metamaterial with a complex field profile. We show that such an antireflection coating must enable spatial engineering of the field profiles at the coating/metamaterial interface to achieve high transmission, and therefore it is required to be inhomogeneous. As a demonstration, we investigate theoretically a waveguide-based negative-index metamaterial, which under normal incidence cannot be excited due to the antisymmetric propagating eigenmode. Through careful engineering of the field profile, lateral position, and thickness of the coating layer, we enhance the transmission under normal incidence from 0 % to 100 % . This principle may generally be applied to overcome low coupling efficiency between incident plane waves and complex mode profiles in metamaterials.

  14. Antireflection coatings for submillimeter silicon lenses

    NASA Astrophysics Data System (ADS)

    Wheeler, Jordan D.; Koopman, Brian; Gallardo, Patricio; Maloney, Philip R.; Brugger, Spencer; Cortes-Medellin, German; Datta, Rahul; Dowell, C. Darren; Glenn, Jason; Golwala, Sunil; McKenney, Chris; McMahon, Jeffery J.; Munson, Charles D.; Niemack, Mike; Parshley, Stephen; Stacey, Gordon

    2014-07-01

    Low-loss lenses are required for submillimeter astronomical applications, such as instrumentation for CCAT, a 25 m diameter telescope to be built at an elevation of 18,400 ft in Chile. Silicon is a leading candidate for dielectric lenses due to its low transmission loss and high index of refraction; however, the latter can lead to large reflection losses. Additionally, large diameter lenses (up to 40 cm), with substantial curvature present a challenge for fabrication of antireflection coatings. Three anti-reflection coatings are considered: a deposited dielectric coating of Parylene C, fine mesh structures cut with a dicing saw, and thin etched silicon layers (fabricated with deep reactive ion etching) for bonding to lenses. Modeling, laboratory measurements, and practicalities of fabrication for the three coatings are presented and compared. Measurements of the Parylene C anti-reflection coating were found to be consistent with previous studies and can be expected to result in a 6% transmission loss for each interface from 0.787 to 0.908 THz. The thin etched silicon layers and fine mesh structure anti-reflection coatings were designed and fabricated on test silicon wafers and found to have reflection losses less than 1% at each interface from 0.787 to 0.908 THz. The thin etched silicon layers are our preferred method because of high transmission efficiency while having an intrinsically faster fabrication time than fine structures cut with dicing saws, though much work remains to adapt the etched approach to curved surfaces and optics < 4" in diameter unlike the diced coatings.

  15. Plasmonic and silicon spherical nanoparticle antireflective coatings

    PubMed Central

    Baryshnikova, K. V.; Petrov, M. I.; Babicheva, V. E.; Belov, P. A.

    2016-01-01

    Over the last decade, plasmonic antireflecting nanostructures have been extensively studied to be utilized in various optical and optoelectronic systems such as lenses, solar cells, photodetectors, and others. The growing interest to all-dielectric photonics as an alternative optical technology along with plasmonics motivates us to compare antireflective properties of plasmonic and all-dielectric nanoparticle coatings based on silver and crystalline silicon respectively. Our simulation results for spherical nanoparticles array on top of amorphous silicon show that both silicon and silver coatings demonstrate strong antireflective properties in the visible spectral range. For the first time, we show that zero reflectance from the structure with silicon coatings originates from the destructive interference of electric- and magnetic-dipole responses of nanoparticle array with the wave reflected from the substrate, and we refer to this reflection suppression as substrate-mediated Kerker effect. We theoretically compare the silicon and silver coating effectiveness for the thin-film photovoltaic applications. Silver nanoparticles can be more efficient, enabling up to 30% increase of the overall absorbance in semiconductor layer. Nevertheless, silicon coatings allow up to 64% absorbance increase in the narrow band spectral range because of the substrate-mediated Kerker effect, and band position can be effectively tuned by varying the nanoparticles sizes. PMID:26926602

  16. Plasmonic and silicon spherical nanoparticle antireflective coatings

    NASA Astrophysics Data System (ADS)

    Baryshnikova, K. V.; Petrov, M. I.; Babicheva, V. E.; Belov, P. A.

    2016-03-01

    Over the last decade, plasmonic antireflecting nanostructures have been extensively studied to be utilized in various optical and optoelectronic systems such as lenses, solar cells, photodetectors, and others. The growing interest to all-dielectric photonics as an alternative optical technology along with plasmonics motivates us to compare antireflective properties of plasmonic and all-dielectric nanoparticle coatings based on silver and crystalline silicon respectively. Our simulation results for spherical nanoparticles array on top of amorphous silicon show that both silicon and silver coatings demonstrate strong antireflective properties in the visible spectral range. For the first time, we show that zero reflectance from the structure with silicon coatings originates from the destructive interference of electric- and magnetic-dipole responses of nanoparticle array with the wave reflected from the substrate, and we refer to this reflection suppression as substrate-mediated Kerker effect. We theoretically compare the silicon and silver coating effectiveness for the thin-film photovoltaic applications. Silver nanoparticles can be more efficient, enabling up to 30% increase of the overall absorbance in semiconductor layer. Nevertheless, silicon coatings allow up to 64% absorbance increase in the narrow band spectral range because of the substrate-mediated Kerker effect, and band position can be effectively tuned by varying the nanoparticles sizes.

  17. Plasmonic and silicon spherical nanoparticle antireflective coatings.

    PubMed

    Baryshnikova, K V; Petrov, M I; Babicheva, V E; Belov, P A

    2016-01-01

    Over the last decade, plasmonic antireflecting nanostructures have been extensively studied to be utilized in various optical and optoelectronic systems such as lenses, solar cells, photodetectors, and others. The growing interest to all-dielectric photonics as an alternative optical technology along with plasmonics motivates us to compare antireflective properties of plasmonic and all-dielectric nanoparticle coatings based on silver and crystalline silicon respectively. Our simulation results for spherical nanoparticles array on top of amorphous silicon show that both silicon and silver coatings demonstrate strong antireflective properties in the visible spectral range. For the first time, we show that zero reflectance from the structure with silicon coatings originates from the destructive interference of electric- and magnetic-dipole responses of nanoparticle array with the wave reflected from the substrate, and we refer to this reflection suppression as substrate-mediated Kerker effect. We theoretically compare the silicon and silver coating effectiveness for the thin-film photovoltaic applications. Silver nanoparticles can be more efficient, enabling up to 30% increase of the overall absorbance in semiconductor layer. Nevertheless, silicon coatings allow up to 64% absorbance increase in the narrow band spectral range because of the substrate-mediated Kerker effect, and band position can be effectively tuned by varying the nanoparticles sizes. PMID:26926602

  18. Antireflective Coatings for Glass and Transparent Polymers.

    PubMed

    Buskens, Pascal; Burghoorn, Marieke; Mourad, Maurice Christian Danho; Vroon, Zeger

    2016-07-12

    Antireflective coatings (ARCs) are applied to reduce surface reflections. We review coatings that reduce the reflection of the surface of the transparent substrates float glass, polyethylene terephthalate, poly(methyl methacrylate), and polycarbonate. Three main coating concepts exist to lower the reflection at the interface of a transparent substrate and air: multilayer interference coatings, graded index coatings, and quarter-wave coatings. We introduce and discuss these three concepts, and zoom in on porous quarter-wave coatings comprising colloidal particles. We extensively discuss the four routes for introducing porosity in quarter-wave coatings through the use of colloidal particles, which have the highest potential for application: (1) packing of dense nanospheres, (2) integration of voids through hollow nanospheres, (3) integration of voids through sacrificial particle templates, and (4) packing of nonspherical nanoparticles. Finally, we address the remaining challenges in the field of ARCs, and elaborate on potential strategies for future research in this area. PMID:27187719

  19. Optical enhancing durable anti-reflective coating

    DOEpatents

    Maghsoodi, Sina; Varadarajan, Aravamuthan; Movassat, Meisam

    2016-07-05

    Disclosed herein are polysilsesquioxane based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In embodiments, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in the polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, Si--OH condensation catalyst and/or nanofillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes including flow coating and roll coating, and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.

  20. High gain durable anti-reflective coating

    DOEpatents

    Maghsoodi, Sina; Brophy, Brenor L.; Colson, Thomas E.; Gonsalves, Peter R.; Abrams, Ze'ev R.

    2016-07-26

    Disclosed herein are polysilsesquioxane-based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In one embodiment, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, thermal radical initiator, photo radical initiators, crosslinkers, Si--OH condensation catalyst and nano-fillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.

  1. Scandium oxide antireflection coatings for superluminescent LEDs

    NASA Technical Reports Server (NTRS)

    Ladany, I.; Zanzucchi, P. J.; Andrews, J. T.; Kane, J.; Depiano, E.

    1986-01-01

    For an employment of laser diodes as superluminescent LEDs (SLDs) or amplifiers, the facets of the diodes must be coated with antireflection films. In the work reported, scandium oxide was evaporated from an e-beam source onto Supersil II fused silica substrates. The obtained samples were used for measurements of absorption and reflectivity. Results of index measurements on e-beam evaporated films are presented. It is shown that excellent coatings with reflectivities of 0.00025 can be obtained using these films. Attention is given to the refractive indices for scandium oxide films as a function of wavelength, the power output vs current for laser before coating and after coating with Sc2O3.

  2. Another Viewpoint On Antireflection Coating Design

    NASA Astrophysics Data System (ADS)

    Willey, Ronald R.

    1990-04-01

    Most antireflection coatings in use today are derived from concepts based on the use of quarter-wave (Q) and half-wave (H) optical thickness layers. We show an alternative and more general way of viewing the concepts and how special cases reduce to the commonly used forms. The monotonically graded inhomogeneous index layer from the substrate to the medium has been extensively reported by Jacobsson and Martensson(1), Dobrowolski and Ho(2), and others. Various oscillating index profiles between the substrate and the medium show promise in producing superior broadband AR coatings. These concepts have evolved from observation of broadband designs using multiple homogeneous quarter- and half-wave optical thickness layers as described by DeBell(3). The viewpoint leads to some further understanding of the possibilities and limitations of AR coatings in general.

  3. Buried nanoantenna arrays: versatile antireflection coating.

    PubMed

    Kabiri, Ali; Girgis, Emad; Capasso, Federico

    2013-01-01

    Reflection is usually a detrimental phenomenon in many applications such as flat-panel-displays, solar cells, photodetectors, infrared sensors, and lenses. Thus far, to control and suppress the reflection from a substrate, numerous techniques including dielectric interference coatings, surface texturing, adiabatic index matching, and scattering from plasmonic nanoparticles have been investigated. A new technique is demonstrated to manage and suppress reflection from lossless and lossy substrates. It provides a wider flexibility in design versus previous methods. Reflection from a surface can be suppressed over a narrowband, wideband, or multiband frequency range. The antireflection can be dependent or independent of the incident wave polarization. Moreover, antireflection at a very wide incidence angle can be attained. The reflection from a substrate is controlled by a buried nanoantenna array, a structure composed of (1) a subwavelength metallic array and (2) a dielectric cover layer referred to as a superstrate. The material properties and thickness of the superstrate and nanoantennas' geometry and periodicity control the phase and intensity of the wave circulating inside the superstrate cavity. A minimum reflectance of 0.02% is achieved in various experiments in the mid-infrared from a silicon substrate. The design can be integrated in straightforward way in optical devices. The proposed structure is a versatile AR coating to optically impedance matches any substrate to free space in selected any narrow and broadband spectral response across the entire visible and infrared spectrum. PMID:24266700

  4. Compatibility of top antireflective coatings and photoresists

    NASA Astrophysics Data System (ADS)

    Li, Ju-Yau; Chuang, Po-Wei; Hsu, Chih-Hsieh F.; Jang, Ben; Chung, Wen-Jye

    1997-08-01

    To improve lithographic process throughput, it has become a general trend to link coater, stepper, and developer to an integrated PHOTO cell. In fine photolithography, TARC (top anti-reflective coating) is utilized intensively to obtain better CD (critical dimension) control. However, the coating of photoresist and TARC is not performed successively. A baking step about 90 seconds is employed in between these two coating steps. Throughput is thus affected and coating step becomes the bottleneck of whole lithography process. A series of experiments were investigated to coat TARC right after photoresist coatings. Results show that throughput was greatly improved. But for certain TARC and photoresist pairs, resist scumming due to inter-mixing of these two chemicals was found after exposure and developing. In some cases, the coater drain piping was stuck by the occurrence of precipitation resulted from the interaction between TARC and photoresist. To prevent this event from happening, precipitation tests of TARC and photoresist are investigated. Experiment was performed by adding TARC to photo resist with/without dilution by thinner. The occurrence of precipitation was observed. Seven kinds of photo resist and three kinds of TARC, provided by different vendors, are studied at different volume ratios on these tests. Results show that the lower photoresist to TARC ratio is, the more precipitation formed. Adding thinner, affecting the precipitation in different ways, induces more precipitation in most cases and cause the precipitation to disappear in some systems. One TARC is found to be inert to most photo resists. Photo resists with higher viscosity turn to gel when interacting with TARC.

  5. A novel approach to antireflection coating using planar metamaterials

    SciTech Connect

    Chen, Hou-tong; Zhou, Jiangfeng; O' Hara, John F; Azad, Abul K; Chen, Frank; Taylor, Antoinette J

    2010-01-01

    We experimentally demonstrate a novel antireflection coating using planar metamaterials. It dramatically reduces the reflectance and enhances the transmittance over a wide range of incidence angles for both polarizations near the designed wavelength.

  6. Advanced Antireflection Coatings for High-Performance Solar Energy Applications

    NASA Technical Reports Server (NTRS)

    Pan, Noren

    2015-01-01

    Phase II objectives: Develop and refine antireflection coatings incorporating lanthanum titanate as an intermediate refractive index material; Investigate wet/dry thermal oxidation of aluminum containing semiconductor compounds as a means of forming a more transparent window layer with equal or better optical properties than its unoxidized form; Develop a fabrication process that allows integration of the oxidized window layer and maintains the necessary electrical properties for contacting the solar cell; Conduct an experimental demonstration of the best candidates for improved antireflection coatings.

  7. High gain durable anti-reflective coating with oblate voids

    DOEpatents

    Maghsoodi, Sina; Brophy, Brenor L.; Colson, Thomas E.; Gonsalves, Peter R.; Abrams, Ze'ev

    2016-06-28

    Disclosed herein are single layer transparent coatings with an anti-reflective property, a hydrophobic property, and that are highly abrasion resistant. The single layer transparent coatings contain a plurality of oblate voids. At least 1% of the oblate voids are open to a surface of the single layer transparent coatings.

  8. Practical anti-reflection coating for metal semiconductor solar cells

    NASA Technical Reports Server (NTRS)

    Yeh, Y.-C. M.; Stirn, R. J.

    1975-01-01

    The metal-semiconductor solar cell is a possible candidate for converting solar to electrical energy for terrestrial application. A method is given for obtaining optical parameters of practical antireflection coatings for the metal-semiconductor solar cell. This method utilizes the measured refractive index obtained from ellipsometry since the surface to be AR coated has a multilayer structure. Both the experimental results and theoretical calculation of optical parameters for Ta2O5 antireflection coatings on Au-GaAs and Au-GaAs(0.78)P(0.22) solar cells are presented for comparison.

  9. Temperature dependence of porous silica antireflective (AR) coating

    NASA Astrophysics Data System (ADS)

    Tang, Yongxing; Le, Yueqin; Zhang, Weiqing; Jiang, Minhua; Sun, Jinren; Liu, Xiaolin

    1998-02-01

    In this paper, the antireflective coatings consisting of porous silica particles from a silica sol are applied by dip method. The relationships among composition, viscosity and temperature have been studied. The coating homogeneity is opium for the laser wavelengths of 1064 nm, 532 nm and 355 nm. The peak transmission of coated BK-7 glass substrate is higher than 99.5%. The laser induced damage thresholds of the antireflective coatings were range of 7 - 10 J/cm2, for 1 ns pulse width and 1064 nm wavelength. These damage thresholds were suitable for our national ICF program. It is noted that the optical homogeneity of coating and the viscosity of coating sol were strongly influenced by the temperatures in the duration of sol ripening.

  10. Measurement of Laser Damage Threshold of 355-nm Antireflection Coating

    NASA Astrophysics Data System (ADS)

    Tamura, Shigeharu; Kimura, Saburo; Sato, Yoshiyuki; Otani, Minoru; Yoshida, Hidetsugu; Yoshida, Kunio

    1989-06-01

    The laser damage thresholds of various types of antireflection (AR) coatings for an UV (355-nm) laser system were measured. Among them, the coatings consisting of two low-index materials, SiO2 and MgF2, had the highest average thresholds: 2.1 J/cm2 on fused silica substrates and 2.6 J/cm2 on sapphire substrates. The SiO2/MgF2 coating is hopeful for UV laser component.

  11. Low-loss antireflection coating for the visible

    NASA Astrophysics Data System (ADS)

    Muscalu, G. L.

    1995-03-01

    It is shown the procedure of achieving a broadband antireflection coating for the visible. The coating structure is composed of 8 layers made of two materials: zirconium dioxide and magnesium fluoride. The experimental efficiency for getting a coating (for the admissibility criterion--specular reflection factor in the spectral (440 - 650) nm coating is achieved under a vacuum system equipped with a photometer that operates at a single wavelength. The coating has the same performances when it is individualized on any type of glass with ne equals 1.48...1.90.

  12. Anti-reflection coatings applied by acid leaching process

    NASA Astrophysics Data System (ADS)

    Pastirik, E.

    1980-09-01

    The Magicote C process developed by S.M. Thompsen was evaluated for use in applying an antireflective coating to the cover plates of solar panels. The process uses a fluosilicic acid solution supersaturated with silica at elevated temperature to selectively attack the surface of soda-lime glass cover plates and alter the physical and chemical composition of a thin layer of glass. The altered glass layer constitutes an antireflective coating. The process produces coatings of excellent optical quality which possess outstanding resistance to soiling and staining. The coatings produced are not resistant to mechanical abrasion and are attacked to some extent by glass cleansers. Control of the filming process was found to be difficult.

  13. Anti-reflection coatings applied by acid leaching process

    NASA Technical Reports Server (NTRS)

    Pastirik, E.

    1980-01-01

    The Magicote C process developed by S.M. Thompsen was evaluated for use in applying an antireflective coating to the cover plates of solar panels. The process uses a fluosilicic acid solution supersaturated with silica at elevated temperature to selectively attack the surface of soda-lime glass cover plates and alter the physical and chemical composition of a thin layer of glass. The altered glass layer constitutes an antireflective coating. The process produces coatings of excellent optical quality which possess outstanding resistance to soiling and staining. The coatings produced are not resistant to mechanical abrasion and are attacked to some extent by glass cleansers. Control of the filming process was found to be difficult.

  14. Millimeter-wave antireflection coating for cryogenic silicon lenses.

    PubMed

    Lau, Judy; Fowler, Joseph; Marriage, Tobias; Page, Lyman; Leong, Jon; Wishnow, Edward; Henry, Ross; Wollack, Ed; Halpern, Mark; Marsden, Danica; Marsden, Gaelen

    2006-06-01

    We have developed and tested an antireflection (AR) coating method for silicon lenses used at cryogenic temperatures and millimeter wavelengths. Our particular application is a measurement of the cosmic microwave background. The coating consists of machined pieces of Cirlex glued to the silicon. The measured reflection from an AR-coated flat piece is less than 1.5% at the design wavelength. The coating has been applied to flats and lenses and has survived multiple thermal cycles from 300 to 4 K. We present the manufacturing method, the material properties, the tests performed, and estimates of the loss that can be achieved in practical lenses. PMID:16724132

  15. Front surface passivation of silicon solar cells with antireflection coating

    NASA Technical Reports Server (NTRS)

    Crotty, G.; Daud, T.; Kachare, R.

    1987-01-01

    It is demonstrated that the deposition and postdeposition sintering of an antireflection (AR) coating in hydrogen acts to passivate silicon solar cells. Cells with and without an SiO2 passivating layer, coated with a TiO(x)/Al2O3 AR coating, showed comparable enhancements in short-wavelength spectral response and in open-circuit voltage Voc after sintering at 400 C for 5 min in a hydrogen ambient. The improvement in Voc of cells without SiO2 is attributed to front-surface passivation by the AR coating during processing.

  16. Process and performance optimization of bottom antireflective coatings: II

    NASA Astrophysics Data System (ADS)

    Ding, Shuji; Sagan, John P.; Shan, Jianhui; Gonzalez, Eleazar; Dixit, Sunit S.; Liu, Ying; Khanna, Dinesh N.

    1999-06-01

    The newly developed AZ BARLi II coating material is a photoresist solvent-based bottom antireflective coating (BARC) for i-line lithographic application. The coating material has good compatibility with common edge bead removal solvents such as ethyl lactate, PGME, or PGMEA mixed with ethyl lactate or PGME. To evaluate the BARC material, its chemical compatibility with common EBR solvents has been tested by several analytical techniques including liquid particle counts and surface defect studies. Both top and bottom EBR dispense processes have been investigated and optimized. Improvements on edge roughness, visual cleanliness, and the BARC coating buildup at the edge will be discussed in this paper.

  17. Design of broadband omnidirectional antireflection coatings using ant colony algorithm.

    PubMed

    Guo, X; Zhou, H Y; Guo, S; Luan, X X; Cui, W K; Ma, Y F; Shi, L

    2014-06-30

    Optimization method which is based on the ant colony algorithm (ACA) is described to optimize antireflection (AR) coating system with broadband omnidirectional characteristics for silicon solar cells incorporated with the solar spectrum (AM1.5 radiation). It's the first time to use ACA method for optimizing the AR coating system. In this paper, for the wavelength range from 400 nm to 1100 nm, the optimized three-layer AR coating system could provide an average reflectance of 2.98% for incident angles from Raveθ+ to 80° and 6.56% for incident angles from 0° to 90°. PMID:24978076

  18. Visual and energy performance of switchable windows with antireflection coatings

    SciTech Connect

    Jonsson, Andreas; Roos, Arne

    2010-08-15

    The aim of this project was to investigate how the visual appearance and energy performance of switchable or smart windows can be improved by using antireflective coatings. For this study clear float glass, low-e glass and electrochromic glass were treated with antireflection (AR) coatings. Such a coating considerably increases the transmittance of solar radiation in general and the visible transmittance in particular. For switchable glazing based on absorptive electrochromic layers in their dark state it is necessary to use a low-emissivity coating on the inner pane of a double glazed window in order to reject the absorbed heat. In principle all surfaces can be coated with AR coatings, and it was shown that a thin AR coating on the low-e surface neither influences the thermal emissivity nor the U-value of the glazing. The study showed that the use of AR coatings in switchable glazing significantly increases the light transmittance in the transparent state. It is believed that this is important for a high level of user acceptance of such windows. (author)

  19. Bilayer structures optimization as antireflective coating for silicon solar cells

    NASA Astrophysics Data System (ADS)

    Zuccon, S.; Zuppella, P.; Corso, A. J.; Pelizzo, M. G.

    2014-10-01

    The optimization of a silicon solar cell involves also the design of a proper antireflective coating (AR). We have considered different bilayer structures. The use of bilayers is oriented to have an antireflective effect on a broader range of wavelengths compared to single film AR. The materials considered include silicon oxide, magnesium fluoride, silicon nitride and titanium oxide. The thickness of each film in each structure has been optimized by theoretical calculations in order to minimize the weighted reflectivity, Rw. This is calculated taking into account the optical reflectivity, the internal quantum efficiency of the silicon solar cell and the solar flux on all the range of wavelengths of interest. Some of these optimized structures have been realized by e-beam vapor deposition as first tests. The improved optical performance of the samples have been verified at the UV-vis-NIR spectrophotometer.

  20. Development of nanostructured antireflection coatings for EO/IR sensor applications

    NASA Astrophysics Data System (ADS)

    Pethuraja, Gopal G.; Welser, Roger E.; Sood, Ashok K.; Efstathiadis, Harry; Haldar, Pradeep; Wijewarnasuriya, Priyalal S.; Dhar, Nibir K.

    2016-05-01

    Electro-optical/infrared (EO/IR) nanosensors are being developed for a variety of defense and commercial systems applications. One of the critical technologies that will enhance EO/IR sensor performance is the development of advanced antireflection coatings. In this paper, we review our latest work on high quality nanostructure-based antireflection structures, including recent efforts to deposit nanostructured antireflection coatings on IR substrates. Nanostructured antireflection coatings fabricated via oblique angle deposition are shown to enhance the optical transmission through transparent windows by minimizing reflection losses at the spectral band of interest to less than one percent, a substantial improvement over conventional thin-film antireflection coating technologies. Step-graded antireflection structures also exhibit excellent omnidirectional performance, and have recently been demonstrated with good performance in medium wavelength and long wavelength IR spectral bands.

  1. NIF Anti-Reflective Coating Solutions: Preparation, Procedures and Specifications

    SciTech Connect

    Suratwala, T; Carman, L; Thomas, I

    2003-07-01

    The following document contains a detailed description of the preparation procedures for the antireflective coating solutions used for NIF optics. This memo includes preparation procedures for the coating solutions (sections 2.0-4.0), specifications and vendor information of the raw materials used and on all equipment used (section 5.0), and QA specifications (section 6.0) and procedures (section 7.0) to determine quality and repeatability of all the coating solutions. There are different five coating solutions that will be used to coat NIF optics. These solutions are listed below: (1) Colloidal silica (3%) in ethanol (2) Colloidal silica (2%) in sec-butanol (3) Colloidal silica (9%) in sec-butanol (deammoniated) (4) HMDS treated silica (10%) in decane (5) GR650 (3.3%) in ethanol/sec-butanol The names listed above are to be considered the official name for the solution. They will be referred to by these names in the remainder of this document. Table 1 gives a summary of all the optics to be coated including: (1) the surface to be coated; (2) the type of solution to be used; (3) the coating method (meniscus, dip, or spin coating) to be used; (4) the type of coating (broadband, 1?, 2?, 3?) to be made; (5) number of optics to be coated; and (6) the type of post processing required (if any). Table 2 gives a summary of the batch compositions and measured properties of all five of these solutions.

  2. Antireflective coatings applied from metal-organic derived liquid precursors.

    PubMed

    Yoldas, B E; O'Keeffe, T W

    1979-09-15

    Antireflective (AR) coatings, which are produced from organometallic driven solutions containing oxide constituents in a chemically polymerized form, are presented. These solutions leave a film on substrates which, upon heat treatment, converts to a glasslike oxide film having the desired optical thickness and index of refraction. The index can be varied continuously from 1.4 to 2.4; thus the AR coatings can be fine-tuned for different substrates and for specific wavelengths of light. Silicon solar cells AR-coated by this technique showed as much as 49% improvement in efficiency over the uncoated state. The real advantage of the process, however, lies in the fact that it is simple, well-suited for automated mass production of photovoltaic cells, and reduces the cost of coating application from an estimated $0.20 per W-package to about $0.01 per W-package. PMID:20212817

  3. Abrasion-resistant antireflective coating for polycarbonate

    NASA Technical Reports Server (NTRS)

    Wydeven, T. J.

    1978-01-01

    Following plasma-polymerization technique, treatment in oxygen glow discharge further enhances abrasion resistance and transmission. Improvement in abrasion resistance was shown by measuring percentage of haze resulting from abrasion. Coating samples were analyzed for abrasion using standard fresh rubber eraser. Other tests included spectra measurements and elemental analysis with spectrometers and spectrophotometers.

  4. Silicon Nitride Antireflection Coatings for Photovoltaic Cells

    NASA Technical Reports Server (NTRS)

    Johnson, C.; Wydeven, T.; Donohoe, K.

    1984-01-01

    Chemical-vapor deposition adapted to yield graded index of refraction. Silicon nitride deposited in layers, refractive index of which decreases with distance away from cell/coating interface. Changing index of refraction allows adjustment of spectral transmittance for wavelengths which cell is most effective at converting light to electric current. Average conversion efficiency of solar cells increased from 8.84 percent to 12.63 percent.

  5. Technical and historical overview of the study at Livermore of porous antireflection coatings

    SciTech Connect

    Milam, D.

    1985-04-04

    The testing program leading to selection of antireflection coatings for the NOVA laser is reviewed. Limiting problems that prevented use of some coating technologies are described, and estimates are made of the current value of pursuing solutions to those problems.

  6. Novel Passivating/Antireflective Coatings for Space Solar Cells

    NASA Technical Reports Server (NTRS)

    Faur, Mircea; Faur, Maria; Bailey, S. G.; Flood, D. J.; Faur, H. M.; Mateescu, C. G.; Alterovitz, S. A.; Scheiman, D.; Jenkins, P. P.; Brinker, D. J.

    2005-01-01

    We are developing a novel process to grow passivating/antireflective (AR) coatings for terrestrial and space solar cells. Our approach involves a Room Temperature Wet Chemical Growth (RTWCG) process, which was pioneered, and is under development at SPECMAT, Inc., under a Reimbursable Space Act Agreement with NASA Glenn Research Center. The RTWCG passivating/AR coatings with graded index of refraction are applied in one easy step on finished (bare) cells. The RTWCG coatings grown on planar, textured and porous Si, as well as on poly-Si, CuInSe2, and III-V substrates, show excellent uniformity irrespective of surface topography, crystal orientation, size and shape. In this paper we present some preliminary results of the RTWCG coatings on Si and III-V substrates that show very good potential for use as a passivation/AR coating for space solar cell applications. Compared to coatings grown using conventional techniques, the RTWCG coatings have the potential to reduce reflection losses and improve current collection near the illuminated surface of space solar cells, while reducing the fabrication costs.

  7. Ultraviolet antireflection coatings for use in silicon detector design

    NASA Astrophysics Data System (ADS)

    Hamden, Erika T.; Greer, Frank; Hoenk, Michael E.; Blacksberg, Jordana; Dickie, Matthew R.; Nikzad, Shouleh; Martin, D. Christopher; Schiminovich, David

    2011-07-01

    We report on the development of coatings for a charged-coupled device (CCD) detector optimized for use in a fixed dispersion UV spectrograph. Because of the rapidly changing index of refraction of Si, single layer broadband antireflection (AR) coatings are not suitable to increase quantum efficiency at all wavelengths of interest. Instead, we describe a creative solution that provides excellent performance over UV wavelengths. We describe progress in the development of a coated CCD detector with theoretical quantum efficiencies (QEs) of greater than 60% at wavelengths from 120 to 300nm. This high efficiency may be reached by coating a backside-illuminated, thinned, delta-doped CCD with a series of thin film AR coatings. The materials tested include MgF2 (optimized for highest performance from 120--150nm), SiO2 (150--180nm), Al2O3 (180--240nm), MgO (200--250nm), and HfO2 (240--300nm). A variety of deposition techniques were tested and a selection of coatings that minimized reflectance on a Si test wafer were applied to functional devices. We also discuss future uses and improvements, including graded and multilayer coatings.

  8. Protective infrared antireflection coating based on sputtered germanium carbide

    NASA Astrophysics Data System (ADS)

    Gibson, Des; Waddell, Ewan; Placido, Frank

    2011-09-01

    This paper describes optical, durablility and environmental performance of a germanium carbide based durable antireflection coating. The coating has been demonstrated on germanium and zinc selenide infra-red material however is applicable to other materials such as zinc sulphide. The material is deposited using a novel reactive closed field magnetron sputtering technique, offering significant advantages over conventional evaporation processes for germanium carbide such as plasma enhanced chemical vapour deposition. The sputtering process is "cold", making it suitable for use on a wide range of substrates. Moreover, the drum format provide more efficient loading for high throughput production. The use of the closed field and unbalanced magnetrons creates a magnetic confinement that extends the electron mean free path leading to high ion current densities. The combination of high current densities with ion energies in the range ~30eV creates optimum thin film growth conditions. As a result the films are dense, spectrally stable, supersmooth and low stress. Films incorporate low hydrogen content resulting in minimal C-H absorption bands within critical infra-red passbands such as 3 to 5um and 8 to 12um. Tuning of germanium carbide (Ge(1-x)Cx) film refractive index from pure germanium (refractive index 4) to pure germanium carbide (refractive index 1.8) will be demonstrated. Use of film grading to achieve single and dual band anti-reflection performance will be shown. Environmental and durability levels are shown to be suitable for use in harsh external environments.

  9. Contamination-resistant silica antireflective coating with closed ordered mesopores.

    PubMed

    Sun, Jinghua; Zhang, Qinghua; Ding, Ruimin; Lv, Haibing; Yan, Hongwei; Yuan, Xiaodong; Xu, Yao

    2014-08-21

    Porous silica optical antireflective (AR) coatings prepared by traditional sol-gel method have been extensively used for high power laser systems, but a serious drawback is that contamination existing in the high vacuum is easily absorbed by the disordered open pore structure, resulting in a fast decrease in transmittance. To improve the stability of transmittance in vacuum, a contamination-resistant silica AR coating with ordered mesopores completely closed by hydrophobic-oleophobic groups was successfully developed on a fused quartz substrate. The ordered mesopores in the coating were controlled under the direction of surfactant F127 via an evaporation-induced-self-assembling process and then were closed by post-grafting long chain fluoroalkylsilane. The grazing incidence small angle X-ray scattering (GISAXS) and the X-ray reflectivity (XRR) results indicated that the mesopores in the coating constructed a Fmmm orthorhombic symmetry structure with a (010) plane parallel to the substrate. Cage-like mesopores were confirmed by nitrogen adsorption-desorption analysis. The obtained coatings showed low surface roughness, excellent abrase-resistance and high transmittance of 100% on quartz substrate. Especially, the decrease of transmittance tested with polydimethylsiloxane pollution in vacuum within one-month was as small as 0.02%. The laser induced damage threshold was up to 59.8 J cm(-2) at a 12 ns laser pulse of 1053 nm wavelength. This work provides an alternative way to fabricate AR coatings with high stability. PMID:25000419

  10. Nanowire-based multifunctional antireflection coatings for solar cells

    NASA Astrophysics Data System (ADS)

    Hiralal, Pritesh; Chien, Chihtao; Lal, Niraj N.; Abeygunasekara, Waranatha; Kumar, Abhishek; Butt, Haider; Zhou, Hang; Unalan, Husnu Emrah; Baumberg, Jeremy J.; Amaratunga, Gehan A. J.

    2014-11-01

    Organic (P3HT/PCBM) solar cells are coated with ZnO nanowires as antireflection coatings and show up to 36% enhancement in efficiency. The improvement is ascribed to an effective refractive index which results in Fabry-Perot absorption bands which match the polymer band-gap. The effect is particularly pronounced at high light incidence angles. Simultaneously, the coating is used as a UV-barrier, demonstrating a 50% reduction in the rate of degradation of the polymers under accelerated lifetime testing. The coating also allows the surface of the solar cell to self-clean via two distinct routes. On one hand, photocatalytic degradation of organic material on ZnO is enhanced by the high surface area of the nanowires and quantified by dye degradation measurements. On the other, the surface of the nanowires can be functionalized to tune the water contact angle from superhydrophilic (16°) to superhydrophobic (152°), resulting in self-cleaning via the Lotus effect. The multifunctional ZnO nanowires are grown by a low cost, low temperature hydrothermal method, compatible with process limitations of organic solar cells.Organic (P3HT/PCBM) solar cells are coated with ZnO nanowires as antireflection coatings and show up to 36% enhancement in efficiency. The improvement is ascribed to an effective refractive index which results in Fabry-Perot absorption bands which match the polymer band-gap. The effect is particularly pronounced at high light incidence angles. Simultaneously, the coating is used as a UV-barrier, demonstrating a 50% reduction in the rate of degradation of the polymers under accelerated lifetime testing. The coating also allows the surface of the solar cell to self-clean via two distinct routes. On one hand, photocatalytic degradation of organic material on ZnO is enhanced by the high surface area of the nanowires and quantified by dye degradation measurements. On the other, the surface of the nanowires can be functionalized to tune the water contact angle

  11. Antireflective graded index silica coating, method for making

    DOEpatents

    Yoldas, Bulent E.; Partlow, Deborah P.

    1985-01-01

    Antireflective silica coating for vitreous material is substantially non-reflecting over a wide band of radiations. This is achieved by providing the coating with a graded degree of porosity which grades the index of refraction between that of air and the vitreous material of the substrate. To prepare the coating, there is first prepared a silicon-alkoxide-based coating solution of particular polymer structure produced by a controlled proportion of water to alkoxide and a controlled concentration of alkoxide to solution, along with a small amount of catalyst. The primary solvent is alcohol and the solution is polymerized and hydrolized under controlled conditions prior to use. The prepared solution is applied as a film to the vitreous substrate and rapidly dried. It is thereafter heated under controlled conditions to volatilize the hydroxyl radicals and organics therefrom and then to produce a suitable pore morphology in the residual porous silica layer. The silica layer is then etched in order to enlarge the pores in a graded fashion, with the largest of the pores remaining being sufficiently small that radiations to be passed through the substrate are not significantly scattered. For use with quartz substrates, extremely durable coatings which display only 0.1% reflectivity have been prepared.

  12. Infrared 8- to 15-μm high-efficiency antireflection coating on germanium substrate

    NASA Astrophysics Data System (ADS)

    Ye, Ke-fei; Su, Zhaoxu; Liu, JiaHuan; Yang, Chongming

    1998-08-01

    To increase the strength of infrared high efficiency antireflection coatings is a problem difficult to be resolved. A mixture of BaF2 and CeF2 has been used as a low refractive index material to design and prepare infrared 8 - 11.5 (mu) high efficiency anti-reflection coating to acquire good strength of film layer. The processing conditions of the films deposition have also been introduced. The spectral transmittance measured, physical and chemical properties of the infrared anti-reflection coating are given.

  13. Nanowire-based multifunctional antireflection coatings for solar cells.

    PubMed

    Hiralal, Pritesh; Chien, Chihtao; Lal, Niraj N; Abeygunasekara, Waranatha; Kumar, Abhishek; Butt, Haider; Zhou, Hang; Unalan, Husnu Emrah; Baumberg, Jeremy J; Amaratunga, Gehan A J

    2014-11-01

    Organic (P3HT/PCBM) solar cells are coated with ZnO nanowires as antireflection coatings and show up to 36% enhancement in efficiency. The improvement is ascribed to an effective refractive index which results in Fabry-Perot absorption bands which match the polymer band-gap. The effect is particularly pronounced at high light incidence angles. Simultaneously, the coating is used as a UV-barrier, demonstrating a 50% reduction in the rate of degradation of the polymers under accelerated lifetime testing. The coating also allows the surface of the solar cell to self-clean via two distinct routes. On one hand, photocatalytic degradation of organic material on ZnO is enhanced by the high surface area of the nanowires and quantified by dye degradation measurements. On the other, the surface of the nanowires can be functionalized to tune the water contact angle from superhydrophilic (16°) to superhydrophobic (152°), resulting in self-cleaning via the Lotus effect. The multifunctional ZnO nanowires are grown by a low cost, low temperature hydrothermal method, compatible with process limitations of organic solar cells. PMID:25350481

  14. Anti-reflection Coatings on Large Area Glass Sheets

    NASA Technical Reports Server (NTRS)

    Pastirik, E.

    1979-01-01

    The first quarter of a one-year program designed to research and perfect a method of producing antireflective coatings on large glass sheets through the use of sodium silicate hardened by exposure to acid is reported. The requirements for a linear motion device used to produce uniform sodium silicate films were determined. A search for a commercially available device is underway. Sodium silicate solutions of varying concentrations were prepared. Determinations of the physical properties relevant to film thickness are in progress. In addition, material costs are being recorded for later use in a cost analysis of the method. All tasks of the project are proceeding according to schedule. Of the tasks, only the sodium silicate solution preparation is complete.

  15. Optimization of multilayer antireflection coating for photovoltaic applications

    NASA Astrophysics Data System (ADS)

    Sikder, Urmita; Zaman, Mohammad Asif

    2016-05-01

    Multilayer antireflection coating (ARC) for photovoltaics is optimized using Differential Evolution (DE) algorithm. A general transfer-matrix based mathematical formulation is used for evaluating reflection spectra of the system. Exact and complete values of refractive indices are used in the analysis to provide higher accuracy of the results. The proposed optimization method takes into account the solar irradiance spectra, absorption characteristics of semiconductors and angle of incidence to maximize efficiency. This method is found to reduce the average reflectance for a wide range of angles of incidence. The proposed method is used to design ARC for silicon solar cell and a multi-junction AlGaAs/GaAs/Ge solar cell. Finally, comparative analysis of different ARC designs is provided in terms of corresponding solar cell characteristics.

  16. Modeling Multilayer Antireflection Coating Systems Based on LiNbO3

    NASA Astrophysics Data System (ADS)

    Karaomerlioglu, Filiz

    Antireflection coatings have had the greatest impact on optics. The antireflection (AR) coating is the critically important technology in obtaining high performance of optoelectronic devices. In the present paper, characteristics of the ferroelectric based multilayered antireflection coating systems are investigated. Multilayer antireflection coatings consisting of insulator thin films have been modeled in the region between the 400 nm and 800 nm visible bands of electromagnetic spectrum to reduce reflectance from ferroelectric based substrate. In this type of antireflection coating we can regulate the optical properties of a system by external electric (or thermal field) and design a broadband low reflection coating system for optoelectronic devices. In order to design and simulate the normal incidence wideband visible multilayer AR coatings, we have developed a Fortran software program based upon Fresnell equations. Different types of layers which are two-different materials like ZnSe and ZrO2 for even-folded multilayer (two-, four-, six-, eight-, ten-, and twelve-layer) antireflection coatings are used. Ferroelectric material, LiNbO3 is used as the substrate. The optical thicknesses of each layer are equal to a quarter-wave thick at a certain wavelength.

  17. Challenges of non-PFOS top antireflective coating material

    NASA Astrophysics Data System (ADS)

    Hsu, Shu-Hao; Vermeir, Inge; Scholze, Matthias; Voigt, Matthias; Gierth, Janine; Mittermeier, Armelle; Mäge, Iris; Voelkel, Lars

    2008-03-01

    Top anti-reflective coating (TARC) material is very useful in decreasing standing waves and minimizing swing amplitude of critical dimensions (CD) because it can reduce the reflectivity of structures by interference. TARC can also help to control resist defects, improve CD uniformity, and solve CD variation issues caused by post exposure bake (PEB) delay. The perfluorooctyl sulfonate (PFOS) or perfluorooctanoic acid (PFOA) are used as a surfactant in actual TARC materials. They can reduce surface tension to improve the coating performance of TARC. However, PFOS and PFOA are restricted for future applications due to environmental concerns and should be omitted from TARC materials. Therefore, material vendors start working hard on Non-PFOS TARC material development. In this paper, the PEB delay behavior with and without TARC was discussed. The effect of PEB delay is not only related to the pattern density, but also strongly related to resist material. According to the testing results, there are still some issues in Non-PFOS TARC materials such as coating performance, material removing, defect control, and film loss etc. Taking these Non-PFOS TARC materials as examples, Non-PFOS TARC-3 could not be dissolved completely in alkaline developer. There are serious embedded defects of Non-PFOS TARC-2 on patterned wafer. Additionally, Non-PFOS TARC-1 shows an acceptable defect level without TARC baking, but it has poor edge coating and more film loss issues. The issue of poor film coating could be solved by coating recipe modification and also by improvements on the material itself made by the material vendor. Therefore, Non-PFOS TARC-1 without TARC baking can be a candidate for a Non-PFOS TARC process because of its acceptable Litho performances and defect density.

  18. New protective antireflecting coating for multispectral ZnS

    NASA Astrophysics Data System (ADS)

    Clark, Caspar C.; Lettington, Alan H.; Wakeham, Steven J.; Jones, Peter S.; Waterman, Dave

    2001-09-01

    With the advent of common aperture systems comes a requirement for substrates and coatings that are transparent in both the visible and IR bands. While there are many suitable bulk materials there are surprisingly few coatings available that offer both antireflecting properties and substrate protection. Materials that need little environmental protection tend to be costly to fabricate and machine while others are far too soft to be of any great use. It is for this reason that particular attention has been given to multispectral zinc sulfide which is a relatively cheap material and has good transparency both in the visible and the IR up to -13micrometers . Although it is a soft material (~150kg.mm-2) it may be protected by a range of coatings. This paper will look at two main materials, ZrN deposited by RF reactive sputtering and YF3 by ion assisted deposition (IAD) which when used in conjunction offer both increased durability to the substrate and good tri-color transmittance for practical window applications.

  19. Applications of antireflection coatings in sonic crystal-based acoustic devices

    NASA Astrophysics Data System (ADS)

    Wang, Yun; Deng, Ke; Xu, Shengjun; Qiu, Chunyin; Yang, Hai; Liu, Zhengyou

    2011-03-01

    The unwanted reflection seriously baffles the practical applications of sonic crystals, such as for various acoustic lenses designed by utilizing the in-band properties of sonic crystals. Herein we introduce the concept of the antireflection coating into the sonic crystal-based devices. The efficiency of such accessorial structures is demonstrated well by an originally high reflection system. Promising perspectives can be anticipated in extending the antireflection coating layers into more general acoustic applications through a flexible design process.

  20. Broad Band Antireflection Coatings for Silicon and Germanium Substrates.

    NASA Astrophysics Data System (ADS)

    Bezuidenhout, Dirk Francois

    Infrared antireflection coatings for silicon and germanium substrates and some of the associated problems are addressed in this thesis. One of the first problems identified and investigated was that of the adhesion of ZnS films to germanium substrates. The cleaning of the Ge discs was evaluated by means of Auger spectroscopy. The main contaminant species found were carbon, oxygen and in the case of germanium substrates sulphur. No sulphur was found on silicon substrates. A wash in a series of organic solutions followed by a bake inside the vacuum chamber lead to much improved though still not acceptable adhesion of ZnS films to germanium substrates. The influence of a contact layer between the substrate and ZnS was investigated. Firstly, metal contact layers (Ni, Cr, Cu) were tried to improve the adhesion of the ZnS films. These samples (germanium-metal-zinc sulphide) were annealed in air in order to transfer the germanium -metal film to a germanide region and thus high optical transmission at long wave-lengths. Slight absorption still results even after the annealing of these samples. A dielectric material, Y_2O_3 , was therefore tested replacing the metal films. The system Ge-Y_2O_3 -ZnS in conjunction with an organic wash and vacuum bake lead to excellent adhesion of the ZnS layers to the germanium substrates. The next problem area addressed was that of a low refractive index material replacement for ThF _4. Four materials were investigated, i.e. ZnS, PbF_2, Y_2O _3 and YF_3. The refractive indices found for these compounds in thin film form at a wavelength of 10 μm is 2,18 for ZnS, 1,7 for PbF_2, 1,42 for Y_2O_3 and 1,3 for YF_3. From these results YF_3 was chosen as low refractive index material in the coating designs. Multi-layer coatings incorporating ZnS, Ge and YF_3 films were designed and evaporated. Measured reflectance values below 0,2% were obtained from 9 μm to 11 mum. These systems were stable and robust. Finally, a silicon ball lens was

  1. Reactively evaporated multilayer antireflection coatings for Ge optical window

    NASA Astrophysics Data System (ADS)

    Asghar, M. H.; Placido, F.; Naseem, S.

    2007-04-01

    Two multilayer antireflection (AR) coating configurations are designed, prepared and characterized. These AR coatings are designed for a 1 mm thick Ge optical window in the 3.25-5.25 µm band. Ta2O5 and TiO2 are used as high index materials along with SiO2 as low index material. Configuration 1 comprises nine alternating layers of SiO2 and Ta2O5, whereas configuration 2 comprises seven alternating layers of SiO2 and TiO2. Post-deposition annealing is also carried out in the temperature range 150-450 °C for 10 h. The prepared multilayered structures are characterized optically and structurally using a spectrophotometer, an atomic force microscope, x-ray diffraction and a scanning electron microscope. Optical characterization shows that multilayered structures have high absorption for as-deposited samples. A considerable improvement in the transmission profiles for the two multilayered configurations is observed at 350 °C with peak and average transmission for both the configurations exceeding 90%. The as-prepared samples show predominantly amorphous-like structure with pronounced peaks for configuration 2 only. Delamination (for configuration 1) and cracking (for configuration 2) of the multilayered structures are witnessed at an annealing temperature of 450 °C.

  2. Thin film type 248-nm bottom antireflective coatings

    NASA Astrophysics Data System (ADS)

    Enomoto, Tomoyuki; Nakayama, Keisuke; Mizusawa, Kenichi; Nakajima, Yasuyuki; Yoon, Sangwoong; Kim, Yong-Hoon; Kim, Young-Ho; Chung, Hoesik; Chon, Sang Mun

    2003-06-01

    A frequent problem encountered by photoresists during the manufacturing of semiconductor device is that activating radiation is reflected back into the photoresist by the substrate. So, it is necessary that the light reflection is reduced from the substrate. One approach to reduce the light reflection is the use of bottom anti-reflective coating (BARC) applied to the substrate beneath the photoresist layer. The BARC technology has been utilized for a few years to minimize the reflectivity. As the chip size is reduced to sub 0.13-micron, the photoresist thickness has to decrease with the aspect ratio being less than 3.0. Therefore, new Organic BARC is strongly required which has the minimum reflectivity with thinner BARC thickness and higher etch selectivity towards resist. SAMSUNG Electronics has developed the advanced Organic BARC with Nissan Chemical Industries, Ltd. and Brewer Science, Inc. for achieving the above purpose. As a result, the suitable high performance SNAC2002 series KrF Organic BARCs were developed. Using CF4 gas as etchant, the plasma etch rate of SNAC2002 series is about 1.4 times higher than that of conventional KrF resists and 1.25 times higher than the existing product. The SNAC2002 series can minimize the substrate reflectivity at below 40nm BARC thickness, shows excellent litho performance and coating properties.

  3. Graded index antireflective coatings for glass. Second annual report

    SciTech Connect

    Haggerty, J.S.

    1980-05-01

    M.I.T. is conducting research which will lead to a process for forming broad band antireflective (AR) coatings on glass. Use of these coatings increases the extractable heat from flat-plate solar collectors by 30 to 50% compared with their performance under equivalent solar flux, surface temperature and ambient conditions without broad band AR coatings. Graded index surface films can virtually eliminate reflection losses if controlled properly. Graded index films on a borosilicate glass (Corning Glass Works No. 7740, Pyrex) has been demonstrated. While glass treated this way exhibited adequate optical properties, the glass itself, cannot be fabricated by the float glass process because of excessive working temperatures, and consequently is too expensive for solar applications. The objective of this work is to define glass compositions and processing steps which will result in graded index surface films (which exhibit broad band AR characteristics) on glasses which can be fabricated by the float glass process. The mechanism by which these graded index surface films are produced on glass surfaces consists of preferentially etching one phase from a phase separated glass. The film which remains consists of a porous structure in which the fraction of solid phase increases continuously from the free surface toward the bulk glass. Scattering effects are eliminated by limiting the size of the pore structure to dimensions which are substantially less than the wavelength of light. With this structure, the local index of refraction is proportional to the fraction of solid phase which is present. Characterizations are intended to define the microstructural and chemical nature of the surface film throughout its thickness. Progress is reported. (WHK)

  4. Transformation-optics-inspired anti-reflective coating design for gradient index lenses.

    PubMed

    Morgan, Kenneth L; Brocker, Donovan E; Campbell, Sawyer D; Werner, Douglas H; Werner, Pingjuan L

    2015-06-01

    Recent developments in transformation optics have led to burgeoning research on gradient index lenses for novel optical systems. Such lenses hold great potential for the advancement of complex optics for a wide range of applications. Despite the plethora of literature on gradient index lenses, previous works have not yet considered the application of anti-reflective coatings to these systems. Reducing system reflections is crucial to the development of this technology for highly sensitive optical applications. Here, we present effective anti-reflective-coating designs for gradient index lens systems. Conventional anti-reflective-design methodologies are leveraged in conjunction with transformation optics to develop coatings that significantly reduce reflections of a flat gradient index lens. Finally, the resulting gradient-index anti-reflective coatings are compared and contrasted with conventional homogeneous anti-reflective coatings. PMID:26030547

  5. Optimization of antireflection coating design for multijunction solar cells and concentrator systems

    NASA Astrophysics Data System (ADS)

    Valdivia, Christopher E.; Desfonds, Eric; Masson, Denis; Fafard, Simon; Carlson, Andrew; Cook, John; Hall, Trevor J.; Hinzer, Karin

    2008-06-01

    Photovoltaic solar cells are a route towards local, environmentally benign, sustainable and affordable energy solutions. Antireflection coatings are necessary to input a high percentage of available light for photovoltaic conversion, and therefore have been widely exploited for silicon solar cells. Multi-junction III-V semiconductor solar cells have achieved the highest efficiencies of any photovoltaic technology, yielding up to 40% in the laboratory and 37% in commercial devices under varying levels of concentrated light. These devices benefit from a wide absorption spectrum (300- 1800 nm), but this also introduces significant challenges for antireflection coating design. Each sub-cell junction is electrically connected in series, limiting the overall device photocurrent by the lowest current-producing junction. Therefore, antireflection coating optimization must maximize the current from the limiting sub-cells at the expense of the others. Solar concentration, necessary for economical terrestrial deployment of multi-junction solar cells, introduces an angular-dependent irradiance spectrum. Antireflection coatings are optimized for both direct normal incidence in air and angular incidence in an Opel Mk-I concentrator, resulting in as little as 1-2% loss in photocurrent as compared to an ideal zero-reflectance solar cell, showing a similar performance to antireflection coatings on silicon solar cells. A transparent conductive oxide layer has also been considered to replace the metallic-grid front electrode and for inclusion as part of a multi-layer antireflection coating. Optimization of the solar cell, antireflection coating, and concentrator system should be considered simultaneously to enable overall optimal device performance.

  6. General optimization of tapered anti-reflective coatings.

    PubMed

    Good, Brandon L; Simmons, Shaun; Mirotznik, Mark

    2016-07-25

    An efficient, general optimized method is outlined that achieves antireflective tapers using lossless, non-dispersive dielectrics. The method modifies the derivative of a perfect antireflective wave amplitude distribution rather than the index of refraction distribution. Modifying the derivative of the wave amplitude distribution minimizes the potential index of refraction distributions and ensures perfect antireflection at one frequency, incidence angle, and linear polarization combination. Additional combinations of frequency, incident angle, and linear polarization can be targeted at a particular reflection coefficient within the optimization. After the method is outlined, three examples are shown with one being fabricated and validated at radiofrequencies. PMID:27464116

  7. Inorganic antireflective coating process for deep-UV lithography

    NASA Astrophysics Data System (ADS)

    He, Qizhi; Lee, Wei W.; Hanratty, Maureen A.; Rogers, Daty; Xing, Guoqiang; Singh, Abha; Zielinski, Eden

    1998-06-01

    Antireflective coatings (ARCs) have been used to enhance IC lithography for years, however, many conventional bottom ARCs can no longer maintain acceptable linewidth control, cannot meet stringent deep-UV (DUV) photoresist processing requirements, and increase the etch complexity. In this paper, we report the development of an inorganic ARC for DUV lithography in sub-0.25 micrometer advanced device applications. Plasma-enhanced chemical vapor deposition (PECVD) is employed to deposit a dielectric film silicon oxynitride (SixOyNz) with specific optical properties. The three optical parameters of the SixOyNz film: refractive index n, extinction coefficient k, and thickness d are specifically designed to ensure that the reflection light that passes through the ARC/substrate is equal in amplitude and opposite in phase to the reflected light from the resist/ARC interface. The reflection light is canceled by destructive interference and therefore photoresist receives the minimum substrate reflection wave. Using this technique, we have successfully patterned features at 0.25 micrometer and below. The dielectric film can not only function as an ARC layer, but also serve as a hardmask for the pattern transfer etch process. With an aggressive etch bias process, linewidths down to 0.60 micrometer poly-Si gate are achieved with good linewidth control (3(sigma) less than 12 nm) and a near perfect linearity. For the marginal metal etch resistance of DUV photoresist, the designed SixOyNz is effective in imparting more etch resistance and suppressing metal substrate reflection. Excellent optical uniformity of the n, k and thickness d of the SixOyNz ARC is obtained with a manufacturable PECVD deposition process.

  8. Wideband antireflection coatings on germanium and filters for second optical window

    NASA Astrophysics Data System (ADS)

    Ciosek, Jerzy; Firak, Jozef; Stanislawek, Urszula; Kwasny, Miroslaw; Kopczynski, Krzysztof

    2003-10-01

    The investigation results of wideband (8-12 μm) antireflection coatings on germanium substrate and spectral characteristics of interference wideband filter for spectral range of 8-12 μm are presented. For design of filters and antireflection coatings the following layer materials were used: Ge, ZnS and Mira, and substrate materials such as: Ge for antireflection coatings and ZnSe for interference filters. Wideband filter for the range of 8-12 μm requires application of additional two filters cutting off radiation from the range of 1-7 μm. The cutting off filters are interference filters for which construction germanium, Mira, and ZnS were used. The constructions of basic and cutting off filters were designed considering technical possibilities of vacuum device BAK 550 of the Balzers firm.

  9. Effects of positive ion implantation into antireflection coating of silicon solar cells

    NASA Technical Reports Server (NTRS)

    Middleton, A. E.; Harpster, J. W.; Collis, W. J.; Kim, C. K.

    1971-01-01

    The state of technological development of Si solar cells for highest obtained efficiency and radiation resistance is summarized. The various theoretical analyses of Si solar cells are reviewed. It is shown that factors controlling blue response are carrier diffusion length, surface recombination, impurity concentration profile in surface region, high level of surface impurity concentration (degeneracy), reflection coefficient of oxide, and absorption coefficient of Si. The theory of ion implantation of charge into the oxide antireflection coating is developed and side effects are discussed. The experimental investigations were directed at determining whether the blue response of Si solar cells could be improved by phosphorus ion charges introduced into the oxide antireflection coating.

  10. Anti-reflective and anti-soiling coatings for self-cleaning properties

    DOEpatents

    Brophy, Brenor L.; Nair, Vinod; Dave, Bakul Champaklal

    2016-05-31

    The disclosure discloses abrasion resistant, persistently hydrophobic and oleophobic, anti-reflective and anti-soiling coatings for glass. The coatings described herein have wide application, including for example the front cover glass of solar modules. Methods of applying the coatings using various apparatus are disclosed. Methods for using the coatings in solar energy generation plants to achieve greater energy yield and reduced operations costs are disclosed. Coating materials are formed by combinations of hydrolyzed silane-base precursors through sol-gel processes. Several methods of synthesis and formulation of coating materials are disclosed.

  11. Tuning the peak position of subwavelength silica nanosphere broadband antireflection coatings

    PubMed Central

    2014-01-01

    Subwavelength nanostructures are considered as promising building blocks for antireflection and light trapping applications. In this study, we demonstrate excellent broadband antireflection effect from thin films of monolayer silica nanospheres with a diameter of 100 nm prepared by Langmuir-Blodgett method on glass substrates. With a single layer of compact silica nanosphere thin film coated on both sides of a glass, we achieved maximum transmittance of 99% at 560 nm. Furthermore, the optical transmission peak of the nanosphere thin films can be tuned over the UV-visible range by changing processing parameters during Langmuir-Blodgett deposition. The tunable optical transmission peaks of the Langmuir-Blodgett films were correlated with deposition parameters such as surface pressure, surfactant concentration, ageing of suspensions and annealing effect. Such peak-tunable broadband antireflection coating has wide applications in diversified industries such as solar cells, windows, displays and lenses. PMID:25136278

  12. Tuning the peak position of subwavelength silica nanosphere broadband antireflection coatings.

    PubMed

    Tao, Fei; Hiralal, Pritesh; Ren, Lianbing; Wang, Yong; Dai, Qing; Amaratunga, Gehan Aj; Zhou, Hang

    2014-01-01

    Subwavelength nanostructures are considered as promising building blocks for antireflection and light trapping applications. In this study, we demonstrate excellent broadband antireflection effect from thin films of monolayer silica nanospheres with a diameter of 100 nm prepared by Langmuir-Blodgett method on glass substrates. With a single layer of compact silica nanosphere thin film coated on both sides of a glass, we achieved maximum transmittance of 99% at 560 nm. Furthermore, the optical transmission peak of the nanosphere thin films can be tuned over the UV-visible range by changing processing parameters during Langmuir-Blodgett deposition. The tunable optical transmission peaks of the Langmuir-Blodgett films were correlated with deposition parameters such as surface pressure, surfactant concentration, ageing of suspensions and annealing effect. Such peak-tunable broadband antireflection coating has wide applications in diversified industries such as solar cells, windows, displays and lenses. PMID:25136278

  13. Reflectance Profile of BaTiO3 on Multilayer Antireflection Coating Systems

    NASA Astrophysics Data System (ADS)

    Karaomerlioglu, Filiz

    2011-05-01

    Antireflection (AR) coating systems are very important technology for optoelectronic devices. The optical characteristics of the system can be regulated by external electric or thermal field, and designed broadband ultra low reflection coating systems. It is investigated optical properties of multilayer AR coatings based on different ferroelectric materials to reduce reflectance in other studies. In this study, reflectance profile of BaTiO3 on multilayer AR coating systems has been developed in the visible region. It has been used ZnSe and ZrO2 as multilayer AR coatings, and BaTiO3 as the substrate. Fortran program has been simulated on Fresnell equations base.

  14. Ge 1- xC x double-layer antireflection and protection coatings

    NASA Astrophysics Data System (ADS)

    Hu, C. Q.; Zheng, W. T.; Li, J. J.; Jiang, Q.; Tian, H. W.; Lu, X. Y.; Liu, J. W.; Xu, L.; Wang, J. B.

    2006-09-01

    The antireflection Germanium carbide (Ge 1- xC x) coating, deposited using RF reactive sputtering, on both sides of ZnS substrate wafer has been developed. The infrared (IR) transmittance spectra show that the IR transmittance in the wavelength region between 8 and 12 μm for the designed system Ge 1- xC x/ZnS/Ge 1- xC x is greatly enhanced compared to that for ZnS substrate. In addition, the double-layer coated ZnS substrate is approximately four times as hard as uncoated ZnS substrate. This investigation indicates that a double-layer Ge 1- xC x coating can be used as an effective antireflection and protection coating on ZnS infrared window.

  15. Moth eye antireflection coated GaInP/GaAs/GaInNAs solar cell

    NASA Astrophysics Data System (ADS)

    Aho, Arto; Tommila, Juha; Tukiainen, Antti; Polojärvi, Ville; Niemi, Tapio; Guina, Mircea

    2014-09-01

    The performance of a GaInP/GaAs/GaInNAs solar cell incorporating AlInP moth eye antireflection coating is reported and compared with the performance of a similar cell comprising TiO2/SiO2 antireflection coating. The moth eye coating exhibits an average reflectance of only 2% within the spectral range from 400 nm to 1600 nm. EQE measurements revealed absorption-related losses in the AlInP moth eye coating at wavelengths below 510 nm. Short wavelength absorption decreases the current generation in the top GaInP junction by 10%. Despite the absorption losses, the moth eye patterned GaInP/GaAs/GaInNAs solar cell exhibited higher current generation under AM1.5G real sun illumination.

  16. Anti-reflection coatings applied by acid-leaching process. Final report

    SciTech Connect

    Pastirik, E.

    1980-09-01

    The Magicote C process developed by S.M. Thompsen was evaluated for use in applying an antireflective coating to the cover plates of solar cell panels. The process uses a fluosilicic acid solution supersaturated with silica at elevated temperature to selectively attack the surface of soda-lime glass cover plates and alter the physical and chemical composition of a thin layer of glass. The altered glass layer constitutes an antireflective coating. The process produces coatings of excellent optical quality which possess outstanding resistance to soiling and staining. The coatings produced are not resistant to mechanical abrasion and are attacked to some extent by glass cleansers. Control of the filming process was found to be difficult.

  17. Reactively sputtered silicon oxy-nitride films for solar absorber anti-reflection coatings

    NASA Astrophysics Data System (ADS)

    Wilson, A. D.

    1984-05-01

    The optical properties of films of SiO(x)N(y) produced by reactive sputtering in argon/oxygen/nitrogen are reported. The refractive index of the films can be continuously varied between 1.46 and 3.4. This large range of index allows considerable freedom in the design of multilayer thin film stacks. The practical use of these films is demonstrated by the fabrication of double layer antireflection coatings for amorphous silicon based solar thermal absorbers. An AM1 solar absorptance of 0.95 has been obtained with an emittance increment due to the antireflecting layers of only 0.055. Other possible uses are also identified.

  18. Plasma-enhanced CVD silicon nitride antireflection coatings for solar cells

    NASA Technical Reports Server (NTRS)

    Johnson, C. C.; Wydeven, T.; Donohoe, K.

    1983-01-01

    Multilayer plasma-enhanced chemical vapor deposition (PECVD) silicon nitride antireflection coatings were deposited on space quality silicon solar cells. Preliminary experiments indicated that multilayer coatings decreased the total reflectance of polished silicon from 35 percent to less than 3 percent over the spectral range 0.4-1.0 micron. The solar cell energy conversion efficiency was increased from an average of 8.84 percent to an average of 12.63 percent.

  19. High performance anti-reflection coatings for broadband multi-junction solar cells

    SciTech Connect

    AIKEN,DANIEL J.

    2000-02-23

    The success of bandgap engineering has made high efficiency broadband multi-junction solar cells possible with photo-response out to the band edge of Ge. Modeling has been conducted which suggests that current double layer anti-reflection coating technology is not adequate for these devices in certain cases. Approaches for the development of higher performance anti-reflection coatings are examined. A new AR coating structure based on the use of Herpin equivalent layers is presented. Optical modeling suggests a decrease in the solar weighted reflectance of over 2.5{percent} absolute as a result. This structure requires no additional optical material development and characterization because no new optical materials are necessary. Experimental results and a sensitivity analysis are presented.

  20. Modified porous silica antireflective coatings with laser damage resistance for Ti:sapphire

    NASA Astrophysics Data System (ADS)

    Jia, Qiaoying; Li, Haiyuan; Liu, Ruijun; Tang, Yongxing; Jiang, Zhonghong

    2005-04-01

    Porous SiO2 antireflective (AR) coatings are prepared from the colloidal silica solution modified with methyltriethoxysilane (MTES) based on the sol-gel route. The viscosity of modified silica suspensions changes but their stability keeps when MTES is introduced. The refractive indices of modified coatings vary little after bake treatment from 100 to 150 Celsius. The modified silica coatings on Ti:sapphire crystal, owning good homogeneity, display prominent antireflective effect within the laser output waveband (750-850 nm) of Ti:sapphire lasers, with average transmission above 98.6%, and own laser induced damage thresholds (LIDTs) of more than 2.2 J/cm2 at 800 nm with the pulse duration of 300 ps.

  1. Anti-reflection Coating for Cryogenic Silicon and Alumina Lenses in Millimeter-Wave Bands

    NASA Astrophysics Data System (ADS)

    Nitta, Tom; Sekiguchi, Shigeyuki; Sekimoto, Yutaro; Mitsui, Kenji; Okada, Norio; Karatsu, Kenichi; Naruse, Masato; Sekine, Masakazu; Matsuo, Hiroshi; Noguchi, Takashi; Seta, Masumichi; Nakai, Naomasa

    2014-09-01

    A dielectric lens with high refractive index is suitable for focusing cryogenic devices in millimeter-wave bands when an appropriate anti-reflection (AR) coating is applied. Two types of AR coatings for silicon and alumina were studied at the millimeter-wave (220 GHz) band: one is by direct machining of mixed epoxy for a silicon lens array, while the other is by laser machining of an antireflective subwavelength structure for a large alumina lens used in a re-imaging optics system. The millimeter-wave optical properties of silicon, alumina, aluminum nitride, and Stycast epoxies were measured with a Fourier Transform Spectrometer (FTS) at cryogenic temperatures. The measured refractive index of the AR coating with a mixture of Stycast 1266 (n = 1.68) and Stycast 2850FTJ (n = 2.2) for silicon at 30 K was 1.84. The thickness of the epoxy AR coating was precisely controlled with direct machining. Transmittance of the AR-coated silicon substrate, measured with FTS, was approximately 95 % at the center frequency of the 220 GHz band with a bandwidth of 25 % at 27 K. An antireflective subwavelength structure was designed for an alumina sample with periodic cylindrical holes. The measured 220-GHz-band transmittance was above 90 % with a bandwidth of 25 % at 25 K.

  2. Enhanced light extraction of Bi3Ge4O12 scintillator by graded-refractive-index antireflection coatings

    NASA Astrophysics Data System (ADS)

    Tong, Fei; Liu, Bo; Chen, Hong; Zhu, Zhichao; Gu, Mu

    2013-08-01

    A three-layer graded-refractive-index antireflection coating is designed and prepared on the one surface of the Bi3Ge4O12 scintillator by sol-gel technology. The emission intensity of the Bi3Ge4O12 with a graded-refractive-index antireflection coating exhibits a broadband and omnidirectional enhancement of 15.9% compared with the reference sample without coating. This significant enhancement is attributed to the decrease of Fresnel reflection, which is consistent with the measurement of transmission spectra. Additionally, it is evident that the graded-refractive-index coating is superior to the conventional quarter-wave coating due to the omnidirectionality advantage.

  3. Interference multilayer antireflection coatings for two wavelengths in the near infrared

    NASA Astrophysics Data System (ADS)

    Pencheva, Tamara G.; Nenkov, Milen; Michev, Javor

    2001-04-01

    The investigation deals with analysis of antireflection coatings of two transparent materials with high (H) and low (L) refractive index for two wavelengths 1.30 micrometer and 1.55 micrometer in the near IR on glass/silica substrates. The results are obtained by numerical optimization approach which algorithms are realized using programming language DELPHI. The initial structures of LHL three-layer and LHLH four-layer coating (optimized for both wavelengths) are modifications of double-layer antireflection coating for one wavelength 1.4 micrometer. It is shown that the highest transmittance near 1.30 and 1.55 micrometer (practically equal to 100%) shows LHLH four-layer coating structure. The total physical and optical thickness of optimized LHLH four-layer coating is smaller than corresponding value for optimized LHL three-layer coating. Four-layer LHLH coating is more stable with respect to small n and d variations and corresponding transmittance changes are less than in case of LHL three-layer coating.

  4. Fabrication of superhydrophilic and antireflective silica coatings on poly(methyl methacrylate) substrates

    SciTech Connect

    Geng, Zhi; He, Junhui; Xu, Ligang

    2012-06-15

    Graphical abstract: Self-cleaning and antireflection properties were successfully achieved by assembling (PDDA/S-20){sub n} coatings on PMMA substrates followed by oxygen plasma treatment. Highlights: ► Porous silica coatings were created by layer-by-layer assembly on PMMA substrates. ► Silica coatings were treated by oxygen plasma. ► Porous silica coatings were highly antireflective and superhydrophilic on PMMA substrates. -- Abstract: Silica nanoparticles of ca. 20 nm in size were synthesized, from which hierarchically porous silica coatings were fabricated on poly(methyl methacrylate) (PMMA) substrates via layer-by-layer (LbL) assembly followed by oxygen plasma treatment. These porous silica coatings were highly transparent and superhydrophilic. The maximum transmittance reached as high as 99%, whereas that of the PMMA substrate is only 92%. After oxygen plasma treatment, the time for a water droplet to spread to a contact angle of lower than 5° decreased to as short as 0.5 s. Scanning and transmission electron microscopy were used to observe the morphology and structure of nanoparticles and coating surfaces. Transmission and reflection spectra were recorded on UV–vis spectrophotometer. Surface wettability was studied by a contact angle/interface system. The influence of mesopores on the transmittance and wetting properties of coatings was discussed on the basis of experimental observations.

  5. Observation of the waveguide resonance in a periodically patterned high refractive index broadband antireflection coating.

    PubMed

    Stenzel, O; Wilbrandt, S; Chen, X; Schlegel, R; Coriand, L; Duparré, A; Zeitner, U; Benkenstein, T; Wächter, C

    2014-05-10

    Grating waveguide structures have been prepared by the deposition of a high refractive index broadband antireflection coating onto a patterned fused silica substrate. Aluminum oxide and hafnium oxide as well as mixtures thereof have been used as coating materials. Optical reflection measurements combined with atomic force microscopy have been used to characterize the structures. Upon illumination with a TE wave, the best structure shows a narrow reflection peak located at 633 nm at an incidence angle of about 17°. The peak reflectance of that sample accounts for more than 89%. Off-resonance interference structures appear strongly suppressed in the spectrum between 450 and 800 nm because of the characteristics of the designed antireflection layer. The structure thus possesses a notch filter spectral characteristic in a broad spectral range. PMID:24922038

  6. Bifacial silicon solar cells in space: Antireflection (AR) coatings and thermal behavior

    NASA Astrophysics Data System (ADS)

    Correig, X.; Calderer, J.

    1986-11-01

    An approach to antireflection coating (ARC) design which recognizes that bifacial silicon solar cell efficiency is related to antireflection coating design and operating temperature by optical, electrical, and thermal behavior of the structure, is proposed. Maximum efficiency coincides neither with minimum temperature nor maximum absorptance. A compromise among these variables can be reached. Calculations make it possible to design ARC to reach an absorptance value near 0.6. Calculations of back side reflectance show that reflectance of isotropic incident light is larger than that of normal incident. Efficiency values are much less affected by ARC thickness. Mass budgets of bifacial arrays are similar to those of monofacial ones, so the only difference in thermal cycle amplitude is due to differences in operating temperature.

  7. Antireflection coatings with SiOx-TiO2 multilayer structures

    NASA Astrophysics Data System (ADS)

    Lu, Jong-Hong; Luo, Jen-Wei; Chuang, Shiou-Ruei; Chen, Bo-Ying

    2014-11-01

    In this study, we used SiOx-TiO2 multilayer antireflective coatings to achieve optical average transmittances of 94.93 and 98.07% for one-sided and double-sided coatings on a glass substrate, respectively. A SiOx film was employed as the material with a low refractive index and a TiO2 film as the material with a high refractive index. Results showed that when any layer thickness of the SiOx-TiO2 nano-multilayer (NML) structure is much less than the wavelength of visible light, the SiOx-TiO2 thickness ratio can be used to adjust the optical refractive index of the entire NML film. In this study, we produced dense antireflective coatings of three layers (SiOx, TiO2, and SiOx-TiO2 NML/glass substrate) and four layers (SiOx, TiO2, SiOx, and TiO2/glass substrate) with film thicknesses and refractive indices controlled by reactive magnetron sputtering. Thermal treatment at 600 °C in an air atmosphere was also shown to reduce the absorption of visible light, resolving the issue of degraded transparency caused by increasing sputtering speed. The microhardness of the antireflective film was 8.44 GPa, similar to that of the glass substrate. Process window analysis demonstrated the feasibility of the antireflective coating process window from an engineering standpoint. The thickness of the film deviated by less than 10% from the ideal thickness, corresponding to a 98% transmittance range, and the simulation and experimental results were relatively consistent.

  8. Plasma polymerized coating for polycarbonate - Single layer, abrasion resistant, and antireflection

    NASA Technical Reports Server (NTRS)

    Wydeven, T.

    1977-01-01

    Plasma polymerized vinyltrimethoxy silane films were deposited on transparent polycarbonate substrates. The adherent, clear films protected the substrates from abrasion and also served as antireflection coatings. Posttreatment of the vinyltrimethoxy silane films in an oxygen glow discharge further improved the abrasion resistance. ESCA (electron spectroscopy for chemical analysis) and IR transmission spectra of some films were recorded, and an elemental analysis of the films was obtained.

  9. Far-infrared filters utilizing small particle scattering and antireflection coatings

    NASA Technical Reports Server (NTRS)

    Armstrong, K. R.; Low, F. J.

    1974-01-01

    High-transmission, low-pass scatter filters for blocking at wavelengths from 3.5 to 50 microns and single-layer antireflection coatings for optical materials used in the 25- to 300-micron region of the spectrum are described. The application of both techniques to liquid-He-cooled filters permits the construction of efficient low-pass and medium-width bandpass filters for use throughout the far infrared.

  10. Moisture resistant and anti-reflection optical coatings produced by plasma polymerization of organic compounds

    NASA Technical Reports Server (NTRS)

    Hollahan, J. R.; Wydeven, T.

    1975-01-01

    The need for protective coatings on critical optical surfaces, such as halide crystal windows or lenses used in spectroscopy, has long been recognized. It has been demonstrated that thin, one micron, organic coatings produced by polymerization of flourinated monomers in low temperature gas discharge (plasma) exhibit very high degrees of moisture resistence, e.g., hundreds of hours protection for cesium iodide vs. minutes before degradation sets in for untreated surfaces. The index of refraction of these coatings is intermediate between that of the halide substrate and air, a condition for anti-reflection, another desirable property of optical coatings. Thus, the organic coatings not only offer protection, but improved transmittance as well. The polymer coating is non-absorbing over the range 0.4 to 40 microns with an exception at 8.0 microns, the expected absorption for C-F bonds.

  11. Single-Step Soft-Imprinted Large-Area Nanopatterned Antireflection Coating.

    PubMed

    van de Groep, Jorik; Spinelli, Pierpaolo; Polman, Albert

    2015-06-10

    We demonstrate an effective nanopatterned antireflection coating on glass that is based on sol-gel chemistry and large-area substrate-conformal soft-imprint technology. The printed 120 nm tall silica nanocylinders with a diameter of 245 nm in a square array with 325 nm pitch form an effective-index (n = 1.20) antireflection coating that reduces the double-sided reflection from a borosilicate glass slide from 7.35% to 0.57% (averaged over the visible spectral range) with a minimum reflectance <0.05% at 590 nm. The nanoglass coating is made using a simple process involving only spin-coating and an imprint step, without vacuum technology or annealing required. The refractive index of the nanoglass layers can be tailored over a broad range by controlling the geometry (1.002 < n < 1.44 in theory), covering a wide range that is not achievable with natural materials. We demonstrate that the nanoglass coating effectively eliminates glare from smart-phone display windows and significantly improves the efficiency of glass-encapsulated solar cells. These features, that are achieved over an angular range as wide as ±50°, together with strong hydrophobicity and mechanical durability, make nanoglass coatings a promising technology to improve the functionality of optoelectronic devices based on glass encapsulation. PMID:26010375

  12. Wideband antireflection coatings combining interference multilayers and subwavelength structures prepared by reactive ion etching

    NASA Astrophysics Data System (ADS)

    Bruynooghe, S.; Helgert, M.; Challier, M.; Tonova, D.; Sundermann, M.; Koch, T.; Gatto, A.; Schulze, M.; Kley, E.-B.

    2015-08-01

    To further reduce the intensity of the Fresnel reflections of optical components, subwavelength structures prepared by reactive ion etching of SiO2 thin films are combined as outermost layer with a multilayer system made of conventional thin film materials and prepared by magnetron sputtering. In this approach, a hybrid coating is realized in which the nanoscaled structured outermost layer is expected to further improve the antireflection properties of common interference stacks. The subwavelength structures are examined by spectroscopic ellipsometry, spectral photometry and scanning electron microscopy. The microscopic and optical spectroscopic analysis revealed that pillar-shaped nanostructures are formed during etching which exhibit low-index properties and have a depth-dependent refractive index. To take into account the index gradient in the coating design, the optical properties of the nanostructures are modeled using the effective medium approximation. The calculated average effective refractive index is 1.11 at 500 nm wavelength. A hybrid coating was designed to minimize the residual reflectance in the 400 - 900 nm spectral range for BK7 glass substrate. Experimental results showed that the hybrid coating achieves a low residual reflectance with very good omni-directional properties, owing to the properties of its nanostructured surface. The residual reflection of the hybrid coating is found to be two times smaller than the reflection obtained by applying a common interference multilayer system which demonstrates the benefit of the use of hybrid systems for the realization of broadband antireflective coatings with wide-angle properties.

  13. Ion-assisted deposition of yttrium fluoride as a substitute for thorium fluoride: application to infrared antireflection coating on germanium

    NASA Astrophysics Data System (ADS)

    Robic, Jean-Yves; Rolland, Bernard; Deutsch, Jean-Claude; Gallais, Patrick

    1994-11-01

    Yttrium fluoride has been proposed as a substitute for thorium fluoride in anti-reflection coatings for the infrared range. We have studied the ion assisted deposition (IAD) of YF3 in order to obtain dense and low absorbency layers in the 8 to 12 mm spectral window. Refractive index and extinction coefficient of this fluoride were determined from spectrophotometry measurements. We have then associated the YF3 with ZnS and Ge layers so as to obtain four layer anti-reflection coatings on germanium. The stress induced by each layer in the coating was measured and the sum was shown to be equal to the stress of the total coating. Eventually, an industrial, high efficiency, both side anti-reflection coating on germanium was developed using IAD YF3 film.

  14. Broad-bandwidth Metamaterial Antireflection Coatings for Sub-Millimeter Astronomy and CMB Foreground Removal

    NASA Astrophysics Data System (ADS)

    McMahon, Jeff

    Sub-millimeter observations are crucial for answering questions about star and galaxy formation; understanding galactic dust foregrounds; and for removing these foregrounds to detect the faint signature of inflationary gravitational waves in the polarization of the Cosmic Microwave Background (CMB). Achieving these goals requires improved, broad-band antireflection coated lenses and half-wave plates (HWPs). These optical elements will significantly boost the sensitivity and capability of future sub-millimeter and CMB missions. We propose to develop wide-bandwidth metamaterial antireflection coatings for silicon lenses and sapphire HWPs with 3:1 ratio bandwidth that are scalable across the sub-millimeter band from 300 GHz to 3 THz. This is an extension of our successful work on saw cut metamaterial AR coatings for silicon optics at millimeter wave lengths. These, and the proposed coatings consist of arrays of sub-wavelength scale features cut into optical surfaces that behave like simple dielectrics. We have demonstrated saw cut 3:1 bandwidth coatings on silicon lenses, but these coatings are limited to the millimeter wave band by the limitations of dicing saw machining. The crucial advance needed to extend these broad band coatings throughout the sub-millimeter band is the development of laser cut graded index metamaterial coatings. The proposed work includes developing the capability to fabricate these coatings, optimizing the design of these metamaterials, fabricating and testing prototype lenses and HWPs, and working with the PIPER collaboration to achieve a sub-orbital demonstration of this technology. The proposed work will develop potentially revolutionary new high performance coatings for the sub-millimeter bands, and cary this technology to TRL 7 paving the way for its use in space. We anticipate that there will be a wide range of applications for these coatings on future NASA balloons and satellites.

  15. High-performance antireflective coatings with a porous nanoparticle layer for visible wavelengths.

    PubMed

    Murata, Tsuyoshi; Ishizawa, Hitoshi; Tanaka, Akira

    2011-03-20

    Ghosts and flares are well-known problems that are caused by reflections from lens surfaces when we take photographs. It is more difficult to prevent such stray light in a digital camera than in a film camera because of high reflectance from the low-pass filter and diffraction from the image sensor. To prevent such stray light, we introduce an ultralow refractive index layer into the antireflective (AR) coatings. We used the solgel method to form porous fluoride layers with ultralow refractive indices, and we succeeded in developing a unique process to form AR coatings with superior performance. PMID:21460972

  16. Plasma-polymerized coating for polycarbonate: Single-layer, abrasion resistant, and antireflection

    NASA Technical Reports Server (NTRS)

    Wydeven, Theodore

    1991-01-01

    Plasma-polymerized vinyl trimethoxy silane films were deposited on transparent polycarbonate substrates. The adherent, clear films protected the substrates from abrasion and also served as antireflection coatings. Post-treatment of the vinyl trimethoxy silane films in an oxygen glow discharge further improved their abrasion resistance. The coatings were characterized by elemental analysis of the bulk, ESCA analysis of the surface, transmission, thickness, abrasion resistance, haze, and adhesion. This patented process is currently used by the world's largest manufacturers of non-prescription sunglasses to protect the plastic glasses from scratching and thereby to increase their useful lifetime.

  17. Fabrication of broadband antireflection coating at terahertz frequency using a hot emboss method

    NASA Astrophysics Data System (ADS)

    Li, YunZhou; Cai, Bin; Zhu, YiMing

    2014-11-01

    We fabricated a terahertz anti-reflective structure on a polystylene by using a hot-embossing method. Polystylene was spin-coated onto a silicon substrate and then transformed by using a metallic mould comprising a bunch of Chinese acupuncture needles. The transformation layer yielded gradient refractive index profiles on the substrate which can reduce the surface reflection effectively. The samples were evaluated by a terahertz time-domain spectroscope. Compared with a bare silicon substrate, we observed an increase of ~30% in the transmittance. We also observed broader bandwidth properties compared with a single-layer antireflective structure. The process imposes no substrate limiting; i.e., it has great potential to be applied onto various THz devices.

  18. Broadband antireflective coatings based on two-dimensional arrays of subwavelength nanopores

    NASA Astrophysics Data System (ADS)

    Baranov, D. A.; Dmitriev, P. A.; Mukhin, I. S.; Samusev, A. K.; Belov, P. A.; Simovski, C. R.; Shalin, A. S.

    2015-04-01

    A broadband thin-film antireflective coating (ARC)—a regular array of nanopores in a dielectric substrate—is studied theoretically and experimentally. Tuning the geometrical parameters of the array allows for strong suppression of reflection. For a fused silica substrate, reflectivity is lower than 1% over a range with a relative bandwidth, 60%-70%, reaching 0.05% in the minimum. The underlying physics is the spatial dispersion in the porous medium which enables phase compensation for the partially reflected waves in a broad band. This allows for more broadband antireflection than any flat homogeneous single-layer ARC can provide. Importantly, the studied ARC is universal for any transparent dielectric substrate.

  19. A Metasurface Anti-reflection Coating for Enhancing Surface Plasmon-Polariton of Metallic Hole Array

    NASA Astrophysics Data System (ADS)

    Bhattarai, Khagendra; Jeon, Jiyeon; Kim, Jun; Ku, Zahyun; Lee, Sang Jun; Zhou, Jiangfeng; Usf, Usa Collaboration; Kriss, Korea Collaboration; Afrl, Usa Collaboration

    We demonstrate a metasurface made of metallic disk resonator array as an anti-reflection (AR) coating to enhance (reduce) the transmission (reflection) through metal hole array (MHA). Our result show that the simulated (measured) transmission at the first order surface plasmon-polariton (SPP) resonance is increased up to 82 %(88%) compared to uncoated MHA. The electric field of the surface wave is also enhanced by 33%. Using an effective medium theory, we show that the metasurface operates at off-resonance wavelengths and can be understood as a thin film that exhibits high effective permittivity (~30) with very low loss (loss tangent ~0.005). Thus we reveal the mechanism of the metasurface AR coating as the traditional thin film AR coating. With tunable effective permittivity, our structure provides great flexibility to achieve AR coating for general substance at any wavelength.

  20. High durability antireflection coatings for silicon and multispectral ZnS

    NASA Astrophysics Data System (ADS)

    Joseph, Shay; Marcovitch, Orna; Yadin, Ygal; Klaiman, Dror; Koren, Nitzan; Zipin, Hedva

    2007-04-01

    In the current complex battle field, military platforms are required to operate on land, at sea and in the air in all weather conditions both day and night. In order to achieve such capabilities, advanced electro-optical systems are being constantly developed and improved. These systems such as missile seeker heads, reconnaissance and target acquisition pods and tracking, monitoring and alert systems have external optical components (window or dome) which must remain operational even at extreme environmental conditions. Depending on the intended use of the system, there are a few choices of window and dome materials. Amongst the more common materials one can point out sapphire, ZnS, germanium and silicon. Other materials such as spinel, ALON and yittria may also be considered. Most infrared materials have high indices of refraction and therefore they reflect a large part of radiation. To minimize the reflection and increase the transmission, antireflection (AR) coatings are the most common choice. Since these systems operate at different environments and weather conditions, the coatings must be made durable to withstand these extreme conditions. In cases where the window or dome is made of relatively soft materials such as multispectral ZnS, the coating may also serve as protection for the window or dome. In this work, several antireflection coatings have been designed and manufactured for silicon and multispectral ZnS. The coating materials were chosen to be either oxides or fluorides which are known to have high durability. Ellipsometry measurements were used to characterize the optical constants of the thin films. The effects of the deposition conditions on the optical constants of the deposited thin films and durability of the coatings will be discussed. The coatings were tested according to MIL-STD-810E and were also subjected to rain erosion tests at the University of Dayton Research Institute (UDRI) whirling arm apparatus in which one of the coatings showed

  1. Performance of "Moth Eye" Anti-Reflective Coatings for Solar Cell Applications

    SciTech Connect

    Clark, E.; Kane, M.; Jiang, P.

    2011-03-14

    An inexpensive, effective anti-reflective coating (ARC) has been developed at the University of Florida to significantly enhance the absorption of light by silicon in solar cells. This coating has nano-scale features, and its microstructure mimics that of various night active insects (e.g. a moth's eye). It is a square array of pillars, each about 700 nm high and having a diameter of about 300 nm. Samples of silicon having this coating were exposed either to various combinations of either elevated temperature and humidity or to gamma irradiation ({sup 60}Co) at the Savannah River National Laboratory, or to a broad spectrum ultraviolet light and to a 532 nm laser light at the University of Florida. The anti-reflective properties of the coatings were unaffected by any of these environmental stresses, and the microstructure of the coating was also unaffected. In fact, the reflectivity of the gamma irradiated ARC became lower (advantageous for solar cell applications) at wavelengths between 400 and 1000 nm. These results show that this coating is robust and should be tested in actual systems exposed to either weather or a space environment. Structural details of the ARCs were studied to optimize their performance. Square arrays performed better than hexagonal arrays - the natural moth-eye coating is indeed a square array. The optimal depth of the templated nanopillars in the ARC was investigated. A wet etching technology for ARC formation was developed that would be less expensive and much faster than dry etching. Theoretical modeling revealed that dimple arrays should perform better than nipple arrays. A method of fabricating both dimple and nipple arrays having the same length was developed, and the dimple arrays performed better than the nipple arrays, in agreement with the modeling. The commercial viability of the technology is quite feasible, since the technology is scalable and inexpensive. This technology is also compatible with current industrial fabrication of

  2. Atomic Layer Deposition of Chemical Passivation Layers and High Performance Anti-Reflection Coatings on Back-Illuminated Detectors

    NASA Technical Reports Server (NTRS)

    Hoenk, Michael E. (Inventor); Greer, Frank (Inventor); Nikzad, Shouleh (Inventor)

    2014-01-01

    A back-illuminated silicon photodetector has a layer of Al2O3 deposited on a silicon oxide surface that receives electromagnetic radiation to be detected. The Al2O3 layer has an antireflection coating deposited thereon. The Al2O3 layer provides a chemically resistant separation layer between the silicon oxide surface and the antireflection coating. The Al2O3 layer is thin enough that it is optically innocuous. Under deep ultraviolet radiation, the silicon oxide layer and the antireflection coating do not interact chemically. In one embodiment, the silicon photodetector has a delta-doped layer near (within a few nanometers of) the silicon oxide surface. The Al2O3 layer is expected to provide similar protection for doped layers fabricated using other methods, such as MBE, ion implantation and CVD deposition.

  3. Antireflective coatings for multijunction solar cells under wide-angle ray bundles.

    PubMed

    Victoria, Marta; Domínguez, César; Antón, Ignacio; Sala, Gabriel

    2012-03-26

    Two important aspects must be considered when optimizing antireflection coatings (ARCs) for multijunction solar cells to be used in concentrators: the angular light distribution over the cell created by the particular concentration system and the wide spectral bandwidth the solar cell is sensitive to. In this article, a numerical optimization procedure and its results are presented. The potential efficiency enhancement by means of ARC optimization is calculated for several concentrating PV systems. In addition, two methods for ARCs direct characterization are presented. The results of these show that real ARCs slightly underperform theoretical predictions. PMID:22453483

  4. Optimized 2D array of thin silicon pillars for efficient antireflective coatings in the visible spectrum

    PubMed Central

    Proust, Julien; Fehrembach, Anne-Laure; Bedu, Frédéric; Ozerov, Igor; Bonod, Nicolas

    2016-01-01

    Light reflection occuring at the surface of silicon wafers is drastically diminished by etching square pillars of height 110 nm and width 140 nm separated by a 100 nm gap distance in a square lattice. The design of the nanostructure is optimized to widen the spectral tolerance of the antireflective coatings over the visible spectrum for both fundamental polarizations. Angle and polarized resolved optical measurements report a light reflection remaining under 5% when averaged in the visible spectrum for both polarizations in a wide angular range. Light reflection remains almost insensitive to the light polarization even in oblique incidence. PMID:27109643

  5. Investigation on antireflection coating for high resistance to potential-induced degradation

    NASA Astrophysics Data System (ADS)

    Mishina, Ken; Ogishi, Atsufumi; Ueno, Kiyoshi; Doi, Takuya; Hara, Kohjiro; Ikeno, Norihiro; Imai, Daisuke; Saruwatari, Tetsuya; Shinohara, Makoto; Yamazaki, Toshiharu; Ogura, Atsushi; Ohshita, Yoshio; Masuda, Atsushi

    2014-01-01

    In this study, we focus on the relationship between potential-induced degradation (PID) and characteristics of antireflection coating (ARC) on crystalline silicon solar cells. We evaluated the PID of general industrial multicrystalline p-type silicon solar cell groups with various ARCs. The module, which has an ARC deposited by plasma-enhanced chemical vapor deposition (PE-CVD) using a hollow cathode, indicated high resistance to PID with maintained conventional refractive index (RI). This ARC had properties of high conductivity and low oxygen concentration. It has the potential to suppress PID on crystalline silicon solar cells with maintained conventional RI.

  6. Development of processing procedures for advanced silicon solar cells. [antireflection coatings and short circuit currents

    NASA Technical Reports Server (NTRS)

    Scott-Monck, J. A.; Stella, P. M.; Avery, J. E.

    1975-01-01

    Ten ohm-cm silicon solar cells, 0.2 mm thick, were produced with short circuit current efficiencies up to thirteen percent and using a combination of recent technical advances. The cells were fabricated in conventional and wraparound contact configurations. Improvement in cell collection efficiency from both the short and long wavelengths region of the solar spectrum was obtained by coupling a shallow junction and an optically transparent antireflection coating with back surface field technology. Both boron diffusion and aluminum alloying techniques were evaluated for forming back surface field cells. The latter method is less complicated and is compatible with wraparound cell processing.

  7. Millimeter-wave broadband antireflection coatings using laser ablation of subwavelength structures

    NASA Astrophysics Data System (ADS)

    Matsumura, Tomotake; Young, Karl; Wen, Qi; Hanany, Shaul; Ishino, Hirokazu; Inoue, Yuki; Hazumi, Masashi; Koch, Jürgen; Suttman, Oliver; Schütz, Viktor

    2016-05-01

    We report on the first use of laser ablation to make sub-millimeter, broad-band, anti-reflection coatings (ARC) based on sub-wavelength structures (SWS) on alumina and sapphire. We used a 515 nm laser to produce pyramid-shaped structures with pitch of about 320 $\\mu$m and total height of near 800 $\\mu$m. Transmission measurements between 70 and 140 GHz are in agreement with simulations using electromagnetic propagation software. The simulations indicate that SWS ARC with the fabricated shape should have a fractional bandwidth response of $\\Delta \

  8. Optimized 2D array of thin silicon pillars for efficient antireflective coatings in the visible spectrum.

    PubMed

    Proust, Julien; Fehrembach, Anne-Laure; Bedu, Frédéric; Ozerov, Igor; Bonod, Nicolas

    2016-01-01

    Light reflection occuring at the surface of silicon wafers is drastically diminished by etching square pillars of height 110 nm and width 140 nm separated by a 100 nm gap distance in a square lattice. The design of the nanostructure is optimized to widen the spectral tolerance of the antireflective coatings over the visible spectrum for both fundamental polarizations. Angle and polarized resolved optical measurements report a light reflection remaining under 5% when averaged in the visible spectrum for both polarizations in a wide angular range. Light reflection remains almost insensitive to the light polarization even in oblique incidence. PMID:27109643

  9. Optimization of hybrid antireflection structure integrating surface texturing and multi-layer interference coating

    NASA Astrophysics Data System (ADS)

    Kubota, Shigeru; Kanomata, Kensaku; Suzuki, Takahiko; Hirose, Fumihiko

    2014-10-01

    The antireflection structure (ARS) for solar cells is categorized to mainly two different techniques, i.e., the surface texturing and the single or multi-layer antireflection interference coating. In this study, we propose a novel hybrid ARS, which integrates moth eye texturing and multi-layer coat, for application to organic photovoltaics (OPVs). Using optical simulations based on the finite-difference time-domain (FDTD) method, we conduct nearly global optimization of the geometric parameters characterizing the hybrid ARS. The proposed optimization algorithm consists of two steps: in the first step, we optimize the period and height of moth eye array, in the absence of multi-layer coating. In the second step, we optimize the whole structure of hybrid ARS by using the solution obtained by the first step as the starting search point. The methods of the simple grid search and the Hooke and Jeeves pattern search are used for global and local searches, respectively. In addition, we study the effects of deviations in the geometric parameters of hybrid ARS from their optimized values. The design concept of hybrid ARS is highly beneficial for broadband light trapping in OPVs.

  10. Anti-Reflective Coatings R&D for Next Generation Neutrinoless Double Beta Experiments

    NASA Astrophysics Data System (ADS)

    Leder, Alexander; Cuore Collaboration

    2016-03-01

    The Cyogenic Underground Observatory for Rare Events (CUORE) is a ton-scale cryogenic source=detector experiment designed to search for the Neutrinoless Double Beta Decay (0 νββ) of 130Te. CUORE currently utilizes a single phonon readout channel per crystal; adding a second channel for scintillation or Cherenkov light would improve particle identification for actively rejecting background events. This light would be collected via semiconductor wafers covered with anti-reflective coatings. These coatings maximize light absorption. In this talk, I will discuss the coating optimization regarding material and structure, and its implications for designing the next generation CUORE-style experiment. In addition, I will discuss projections for possible sensitivities of next generation 0 νββ searches that use dual channel light-phonon readouts.

  11. Broadband Plasma-Sprayed Anti-reflection Coating for Millimeter-Wave Astrophysics Experiments

    NASA Astrophysics Data System (ADS)

    Jeong, O.; Lee, A.; Raum, C.; Suzuki, A.

    2016-02-01

    We have developed a plasma-sprayed anti-reflection (AR) coating technology for millimeter-wave astrophysics experiments with cryogenic optics which achieves minimal dissipative loss and broad bandwidth and is easily and accurately applied. Plasma spraying is a coating process through which melted or heated materials are sprayed onto a substrate. The dielectric constants of the plasma-sprayed coatings were tuned between 2.7 and 7.9 by mixing hollow ceramic microspheres with alumina powder as the base material and varying the plasma energy of the spray. By spraying low loss ceramic materials with a tunable dielectric constant, we can apply multiple layers of AR coating for broadband millimeter-wave detection. At 300 K, we achieved a fractional bandwidth of 106 over 90% transmission using a three-layer AR coating. Applying ceramic coatings on ceramic lenses offers an additional benefit of preventing cryogenic delamination of the coatings. We report on methodology of coating application and measurement of uniformity, repeatability, transmission property, and cryogenic adhesion performance.

  12. Solgel derived tantalum pentoxide films as ultraviolet antireflective coatings for silicon.

    PubMed

    Rehg, T J; Ochoa-Tapia, J A; Knoesen, A; Higgins, B G

    1989-12-15

    A solgel process is described to produce Ta(2)O(5) films as short wavelength antireflective (AR) coatings for silicon. The AR coatings were optimized for 370 nm by controlling the acid catalyzed hydrolysis of Ta(OC(2)H(5))(5), the spin coating parameters, and the heat treatment process (rapid thermal processing (RTP) and muffle furnace). Film thickness uniformity across the wafer was better than 1%, and all the coatings tested passed the standard scotch tape test before and after heat treatment and exhibited no change in optical properties after submersion in liquid N(2). Several heat treatment protocols for densifying the films were studied. Spin coated films heat treated in a muffle furnace at 275 degrees C yielded Ta(2)O(5) AR coatings that reduced the reflectance losses from silicon at 370 nm by 86%, the reduction being within 1% of the theoretical value. Films subjected to RTP at temperatures ranging from 300 to 1000 degrees C reduced the reflectance loss in some cases by as much as 95%. The results demonstrate that spin coated solgel derived Ta(2)O(5) films subjected to a low temperature (<300 degrees C) heat treatment can form durable films suitable for near UV AR coatings for high index silicon devices, such as charge couple imagers and photovoltaic cells. PMID:20556030

  13. Broadband Plasma-Sprayed Anti-reflection Coating for Millimeter-Wave Astrophysics Experiments

    NASA Astrophysics Data System (ADS)

    Jeong, O.; Lee, A.; Raum, C.; Suzuki, A.

    2016-08-01

    We have developed a plasma-sprayed anti-reflection (AR) coating technology for millimeter-wave astrophysics experiments with cryogenic optics which achieves minimal dissipative loss and broad bandwidth and is easily and accurately applied. Plasma spraying is a coating process through which melted or heated materials are sprayed onto a substrate. The dielectric constants of the plasma-sprayed coatings were tuned between 2.7 and 7.9 by mixing hollow ceramic microspheres with alumina powder as the base material and varying the plasma energy of the spray. By spraying low loss ceramic materials with a tunable dielectric constant, we can apply multiple layers of AR coating for broadband millimeter-wave detection. At 300 K, we achieved a fractional bandwidth of 106 over 90% transmission using a three-layer AR coating. Applying ceramic coatings on ceramic lenses offers an additional benefit of preventing cryogenic delamination of the coatings. We report on methodology of coating application and measurement of uniformity, repeatability, transmission property, and cryogenic adhesion performance.

  14. Characterization of Silicon Moth-Eye Antireflection Coatings for Astronomical Applications in the Infrared

    NASA Astrophysics Data System (ADS)

    Jeram, Sarik; Ge, Jian; Jiang, Peng; Phillips, Blayne

    2016-01-01

    Silicon moth-eye antireflective structures have emerged to be an excellent approachfor reducing the amount of light that is lost upon incidence on a given surface of optics made of silicon. This property has been exploited for a wide variety of products ranging from eyeglasses and flat-panel displays to solar panels. These materials typically come in the form of coatings that are applied to an optical substrate such as glass. Moth-eye coatings, made of a periodic array of subwavelength pillars on silicon substrates or other substrates, can produce the desired antireflection (AR) performance for a broad wavelength range and over a wide range of incident angles. In the field of astronomy, every photon striking a detector is significant - and thus, losses from reflectivity at the various optical interfaces before a detector can have significant implications to the science at hand. Moth-eye AR coatings on these optical interfaces may minimize their reflection losses while maximizing light throughput for a multitude of different astronomical instruments. In addition, moth-eye AR coatings, which are patterned directly on silicon surfaces, can significantly enhance the coating durability. At the University of Florida, we tested two moth-eye filters designed for use in the near-infrared regime at 1-8 microns by examining their optical properties, such as transmission, the scattered light, and wavefront quality, and testing the coatings at cryogenic temperatures to characterize their viability for use in both ground- and space-based infrared instruments. This presentation will report our lab evaluation results.

  15. Advancements in organic antireflective coatings for dual-damascene processes

    NASA Astrophysics Data System (ADS)

    Deshpande, Shreeram V.; Shao, Xie; Lamb, James E., III; Brakensiek, Nickolas L.; Johnson, Joe; Wu, Xiaoming; Xu, Gu; Simmons, William J.

    2000-06-01

    Dual Damascene (DD) process has been implemented in manufacturing semiconductor devices with smaller feature sizes (coating (BARC) is used, then the resist thickness variations are minimized thus enhancing the resolution and CD control in trench patterning. Via fill organic BARC materials can also act as etch blocks at the base of the via to protect the substrate from over etch. In this paper we review the important role of via fill organic BARCs in improving the efficiency of via first DD process now being implemented in semiconductor manufacturing.

  16. Conducting antireflection coatings with low polarization dependent loss for telecommunication applications.

    PubMed

    Dobrowolski, J; Ford, Joseph; Sullivan, Brian; Lu, Liping; Osborne, Norman

    2004-12-13

    Conducting optical coatings for the visible light range are commonly made of Indium Tin Oxide (ITO), but ITO is unsuitable for near-infrared telecommunications wavelengths because it can become absorptive after extended illumination. In this paper we show an alternative approach which uses conventional coating materials to create either non-conducting or conducting antireflection (AR) coatings that are effective over a fairly broad spectral region ( lambdalong/lambdashort approximately 1.40) and also usable for a wide range of angles of incidence (0-38 masculine, or 0-55 masculine) in the telecom wavelength range. Not only is the transmittance of windows treated with such coatings quite high, but they can be made to have extreme polarization independence (low polarization dependent loss values). A number of such coating designs are presented in the paper. A prototype of one of the conducting AR coating designs was fabricated and the measurements were found to be in reasonable agreement with the calculated performance. Such AR coatings should be of interest for telecommunication applications and especially for anti-static hermetic packaging of MEMS devices such as optical switches. PMID:19488272

  17. Anti-Reflective Coating On Borosilicate Long Tubes Industrial Process And Quality Control

    NASA Astrophysics Data System (ADS)

    Eisenberg, N.; Ben-Dor, Y.; Warschawski, J. P.

    1989-07-01

    It has been shown that in order to improve the optical efficiency of a solar trough evacuated pipe used for Luz solar electricity generating systems, an appropriate low cost anti-reflective coating process should be implemented in the solar collector production line, and that a dip process is the optimal choice for this application. It is shown in this paper that pumping the coating solution out of the coating container rather than withdrawing the tubes is the most appropriate coating process for Luz's needs. The same method was employed for the second coating solution which was used both for mechanical abrasion resistance improvement and for increasing optical transmissivity. The measuring procedure for quality insurance of the coated tube was investigated thoroughly and an "in-house" technique, including solar simulation and spiral movement of the tested tube, was chosen in preference to the other standard procedures (spectrophotometry, reflectometry). The complete AR coating facility and production procedure is described and the results of the industrial process are analyzed.

  18. An In-House Thermal Evaporation System for Anti-Reflection An In-House Thermal Evaporation System for Anti-Reflection Coating of Laser Diodes

    NASA Astrophysics Data System (ADS)

    Nagel, Sarah; Nguyen, Duong; Killian, Thomas; Hulet, Randall

    2006-05-01

    Laser diodes have become a very popular and powerful tool in AMO research due to their frequency tunability, small size and low cost. These devices are often used in external cavity diode lasers (ECDL) and injection locked amplifers. In both cases, in order to maintain frequency stability, the reflectivity of the diode facet must be as low as possible. Anti-reflection coating these devices is a commerically available, but rather expensive, procedure. In this poster, we present an in-house thermal evaporation system designed for coating diode lasers with SiO in a vacuum chamber capable of reaching 10-5 torr. We monitor the coating process by measuing the threshold current of the laser diode in-situ. We present reflectivity and coating stability results.

  19. Optimization of the cooling profile to achieve crack-free Yb:S-FAP crystals

    NASA Astrophysics Data System (ADS)

    Fang, H. S.; Qiu, S. R.; Zheng, L. L.; Schaffers, K. I.; Tassano, J. B.; Caird, J. A.; Zhang, H.

    2008-08-01

    Yb:S-FAP [Yb 3+:Sr 5(PO 4) 3F] crystals are an important gain medium for diode-pumped laser applications. Growth of 7.0 cm diameter Yb:S-FAP crystals utilizing the Czochralski (CZ) method from SrF 2-rich melts often encounters cracks during the post-growth cool-down stage. To suppress cracking during cool-down, a numerical simulation of the growth system was used to understand the correlation between the furnace power during cool-down and the radial temperature differences within the crystal. The critical radial temperature difference, above which the crystal cracks, has been determined by benchmarking the simulation results against experimental observations. Based on this comparison, an optimal three-stage ramp-down profile was implemented, which produced high-quality, crack-free Yb:S-FAP crystals.

  20. Optimization of the cooling profile to achieve crack-free Yb:S-FAP crystals

    SciTech Connect

    Fang, H; Qiu, S; Kheng, L; Schaffers, K; Tassano, J; Caird, J; Zhang, H

    2007-08-20

    Yb:S-FAP [Yb{sup 3+}:Sr{sub 5}(PO{sub 4}){sub 3}F] crystals are an important gain medium for diode-pumped laser applications. Growth of 7.0 cm diameter Yb:S-FAP crystals utilizing the Czochralski (CZ) method from SrF{sub 2}-rich melts often encounter cracks during the post growth cool down stage. To suppress cracking during cool down, a numerical simulation of the growth system was used to understand the correlation between the furnace power during cool down and the radial temperature differences within the crystal. The critical radial temperature difference, above which the crystal cracks, has been determined by benchmarking the simulation results against experimental observations. Based on this comparison, an optimal three-stage ramp-down profile was implemented and produced high quality, crack-free Yb:S-FAP crystals.

  1. Low-cost and broadband terahertz antireflection coatings based on DMSO-doped PEDOT/PSS.

    PubMed

    Yan, Fei; Parrott, Edward P J; Liu, Xu Dong; Pickwell-MacPherson, Emma

    2015-06-15

    We report the potential application of 6% dimethylsulfoxide (DMSO)-doped poly (3, 4-ethylenedioxythiophene)/poly (4-styrenesulfonate) (PEDOT/PSS) as a low cost and broadband terahertz (THz) antireflection coating based on the impedance matching effect. The reflected pulses from the quartz and silicon substrates are observed to change with the thickness of the PEDOT/PSS layer. Theoretical analysis based on an equivalent transmission line circuit model and FDTD computational simulations have been used to understand the experimental results. Excellent impedance matching is achieved by a ∼39-nm-thick 6% DMSO-doped PEDOT/PSS layer on quartz, and a ∼101-nm-thick 6% DMSO-doped PEDOT/PSS layer on silicon due to the almost-frequency-independent conductivity of the thin film between 0.3 and 2.5 THz. In the critical conditions, the normalized main pulse transmission remains as high as 74% and 64%, for the quartz and silicon substrates, respectively, significantly higher than the existing state of the art THz antireflection coatings. PMID:26076287

  2. Novel conformal organic antireflective coatings for advanced I-line lithography

    NASA Astrophysics Data System (ADS)

    Deshpande, Shreeram V.; Nowak, Kelly A.; Fowler, Shelly; Williams, Paul; Arjona, Mikko

    2001-08-01

    Flash memory chips are playing a critical role in semiconductor devices due to increased popularity of hand held electronic communication devices such as cell phones and PDAs (personal Digital Assistants). Flash memory offers two primary advantages in semiconductor devices. First, it offers flexibility of in-circuit programming capability to reduce the loss from programming errors and to significantly reduce commercialization time to market for new devices. Second, flash memory has a double density memory capability through stacked gate structures which increases the memory capability and thus saves significantly on chip real estate. However, due to stacked gate structures the requirements for manufacturing of flash memory devices are significantly different from traditional memory devices. Stacked gate structures also offer unique challenges to lithographic patterning materials such as Bottom Anti-Reflective Coating (BARC) compositions used to achieve CD control and to minimize standing wave effect in photolithography. To be applicable in flash memory manufacturing a BARC should form a conformal coating on high topography of stacked gate features as well as provide the normal anti-reflection properties for CD control. In this paper we report on a new highly conformal advanced i-line BARC for use in design and manufacture of flash memory devices. Conformal BARCs being significantly thinner in trenches than the planarizing BARCs offer the advantage of reducing BARC overetch and thus minimizing resist thickness loss.

  3. Surface structured optical coatings with near-perfect broadband and wide-angle antireflective properties.

    PubMed

    Perl, Emmett E; McMahon, William E; Farrell, Robert M; DenBaars, Steven P; Speck, James S; Bowers, John E

    2014-10-01

    Optical thin-film coatings are typically limited to designs where the refractive index varies in only a single dimension. However, additional control over the propagation of incoming light is possible by structuring the other two dimensions. In this work, we demonstrate a three-dimensional surface structured optical coating that combines the principles of thin-film optical design with bio-inspired nanostructures to yield near-perfect antireflection. Using this hybrid approach, we attain average reflection losses of 0.2% on sapphire and 0.6% on gallium nitride for 300-1800 nm light. This performance is maintained to very wide incidence angles, achieving less than 1% reflection at all measured wavelengths out to 45° for sapphire. This hybrid design has the potential to significantly enhance the broadband and wide-angle properties for a number of optical systems that require high transparency. PMID:25238041

  4. New artificial dielectric metamaterial and its application as a terahertz antireflection coating.

    PubMed

    Zhang, J; Ade, P A R; Mauskopf, P; Moncelsi, L; Savini, G; Whitehouse, N

    2009-12-10

    We describe a novel artificial dielectric material that has applications at millimeter and submillimeter wavelengths. The material is manufactured from layers of metal mesh patterned onto thin polypropylene sheets, which are then bonded together using a hot pressing process to provide planar rugged discs that can be reliably cycled to cryogenic temperatures. The refractive index of this material can be tuned by adjusting the geometry and spacing of the metal mesh layers. We demonstrate its usage by designing and characterizing a broadband antireflection coating for a Z-cut crystalline quartz plate. The coating was fabricated and applied to the quartz using the hot press technique and characterized using a Fourier transform spectrometer. The performance is shown to be in good agreement with a high frequency structure simulator and transmission line modeling results. PMID:20011003

  5. An anti-reflection coating for use with PMMA at 193 nm

    NASA Astrophysics Data System (ADS)

    Yen, Anthony; Smith, Henry I.; Schattenburg, M. L.; Taylor, Gary N.

    1992-02-01

    An antireflection coating (ARC) for use with poly(methyl methacrylate) (PMMA) resist for ArF excimer laser lithography (193 nm) was formulated. It consists of PMMA and a bis-azide, 4.4-prime-diazidodiphenyl sulfone (DDS) which crosslinks the film after deep UV (260 nm) irradiation and subsequent annealing. The reacted DDS then serves as the absorber for the 193 nm radiation and also prevents mixing of the ARC and PMMA during PMMA spin-coating and development. The effectiveness of the ARC was demonstrated by exposing, in PMMA, using achromatic holographic lithography, gratings of 100 nm period (about 50 nm linewidth) that are almost entirely free of an orthogonal standing wave.

  6. An anti-reflection coating for use with PMMA at 193 nm

    NASA Technical Reports Server (NTRS)

    Yen, Anthony; Smith, Henry I.; Schattenburg, M. L.; Taylor, Gary N.

    1992-01-01

    An antireflection coating (ARC) for use with poly(methyl methacrylate) (PMMA) resist for ArF excimer laser lithography (193 nm) was formulated. It consists of PMMA and a bis-azide, 4.4-prime-diazidodiphenyl sulfone (DDS) which crosslinks the film after deep UV (260 nm) irradiation and subsequent annealing. The reacted DDS then serves as the absorber for the 193 nm radiation and also prevents mixing of the ARC and PMMA during PMMA spin-coating and development. The effectiveness of the ARC was demonstrated by exposing, in PMMA, using achromatic holographic lithography, gratings of 100 nm period (about 50 nm linewidth) that are almost entirely free of an orthogonal standing wave.

  7. Diamondlike carbon as a moisture barrier and antireflecting coating on optical materials

    NASA Technical Reports Server (NTRS)

    Woollam, John A.; De, Bhola N.; Chen, L. Y.; Pouch, John J.; Alterovitz, Samuel A.

    1990-01-01

    Diamondlike carbon (DLC) is amorphous, hard, semitransparent, and is under consideration for use as a coating material for infrared optics. DLC is also designated as a-C:H to indicate its amorphous nature as well as to indicate the presence of large (20 to 55 percent) amounts of hydrogen in the film. Two important questions arise with respect to use of DLC in infrared optics. Will the lack of grain boundaries help to keep moisture from penetrating the film. Secondly, application as an antireflection coating places restrictions on the allowed values of the index of refraction of the film relative to the particular substrate material being used. Will DLC have the correct index range. These two questions are addressed in this paper.

  8. Recovery Act: A Low Cost Spray Deposited Solar PV Anti-Reflection Coating Final Technical Report

    SciTech Connect

    Harvey, Michael D.

    2010-08-30

    PV module glass is typically low iron glass which exhibits extremely low absorption of light at solar wavelengths. However, reflection losses from typical high quality solar glass are about 4.5% of the input solar energy. By applying an antireflection coating to the cover glass of their modules, a PV module maker will gain at least a 3% increase in the light passing through the glass and being converted to electricity. Thus achieving an increase of >3% in electricity output from the modules. This Project focussed on developing a process that deposits a layer of porous silica (SiO2) on glass or plastic components, and testing the necessary subcomponents and subsystems required to demonstrate the commercial technology. This porous layer acts as a broadband single layer AR coating for glass and plastics, with the added benefit of being a hydrophilic surface for low surface soiling.

  9. Recent developments in highly durable protective/antireflection coatings for Ge and ZnS substrates

    NASA Astrophysics Data System (ADS)

    Hasan, Wasim; Propst, Steven H.

    1994-11-01

    Antireflection coated ZnS and Ge substrates erode under severe operational environmental conditions. High velocity water drop impact and high velocity sand particle impact are primarily military concerns that originated with the advent of faster aircraft. High speed flight through rain and sand storms seriously erodes forward facing components such as infrared transmitting windows and/or domes. This erosion of windows and/or domes causes reduction in transmission, resulting in the reduction of detection and recognition sensitivity of the electro-optical sensor. A single film of one quarterwave thick hard-carbon coating has been used on germanium to increase optical transmission (reducing Fresnel's reflection losses on Ge surface) as well as to reduce rain and sand impact damage to some extent, at a lower speed. At high speed, the damage becomes more severe, resulting in unacceptable large transmission losses. Recently, new hard carbon coatings have been developed for Ge which have substantially increased the damage threshold of the coated substrates. The rain erosion test was performed at Wright-Patterson AFB facility in Dayton, Ohio, and the sand tests were performed at PDA Engineering in Santa Ana, California. In addition, a multilayer AR coating utilizing hard carbon film as one of the low index films has also been developed at Hughes for ZnS substrates. The optical properties, rain erosion, sand erosion, and sand abrasion test results of these coatings are also presented in this paper.

  10. Large-aperture wide-bandwidth antireflection-coated silicon lenses for millimeter wavelengths.

    PubMed

    Datta, R; Munson, C D; Niemack, M D; McMahon, J J; Britton, J; Wollack, E J; Beall, J; Devlin, M J; Fowler, J; Gallardo, P; Hubmayr, J; Irwin, K; Newburgh, L; Nibarger, J P; Page, L; Quijada, M A; Schmitt, B L; Staggs, S T; Thornton, R; Zhang, L

    2013-12-20

    The increasing scale of cryogenic detector arrays for submillimeter and millimeter wavelength astrophysics has led to the need for large aperture, high index of refraction, low loss, cryogenic refracting optics. Silicon with n=3.4, low loss, and high thermal conductivity is a nearly optimal material for these purposes but requires an antireflection (AR) coating with broad bandwidth, low loss, low reflectance, and a matched coefficient of thermal expansion. We present an AR coating for curved silicon optics comprised of subwavelength features cut into the lens surface with a custom three-axis silicon dicing saw. These features constitute a metamaterial that behaves as a simple dielectric coating. We have fabricated silicon lenses as large as 33.4 cm in diameter with micromachined layers optimized for use between 125 and 165 GHz. Our design reduces average reflections to a few tenths of a percent for angles of incidence up to 30° with low cross polarization. We describe the design, tolerance, manufacture, and measurements of these coatings and present measurements of the optical properties of silicon at millimeter wavelengths at cryogenic and room temperatures. This coating and lens fabrication approach is applicable from centimeter to submillimeter wavelengths and can be used to fabricate coatings with greater than octave bandwidth. PMID:24513939

  11. Large-aperture Wide-bandwidth Antireflection-coated Silicon Lenses for Millimeter Wavelengths

    NASA Technical Reports Server (NTRS)

    Datta, R.; Munson, C. D.; Niemack, M. D.; McMahon, J. J.; Britton, J.; Wollack, Edward J.; Beall, J.; Devlin, M. J.; Fowler, J.; Gallardo, P.; Hubmayr, J.; Irwin, K.; Newburgh, L.; Nibarger, J. P.; Page, L.; Quijada, Manuel A.; Schmitt, B. L.; Staggs, S. T.; Thornton, R.; Zhang, L.

    2013-01-01

    The increasing scale of cryogenic detector arrays for submillimeter and millimeter wavelength astrophysics has led to the need for large aperture, high index of refraction, low loss, cryogenic refracting optics. Silicon with n 3.4, low loss, and high thermal conductivity is a nearly optimal material for these purposes but requires an antireflection (AR) coating with broad bandwidth, low loss, low reflectance, and a matched coefficient of thermal expansion. We present an AR coating for curved silicon optics comprised of subwavelength features cut into the lens surface with a custom three-axis silicon dicing saw. These features constitute a metamaterial that behaves as a simple dielectric coating.We have fabricated silicon lenses as large as 33.4 cm in diameter with micromachined layers optimized for use between 125 and 165 GHz. Our design reduces average reflections to a few tenths of a percent for angles of incidence up to 30deg with low cross polarization.We describe the design, tolerance, manufacture, and measurements of these coatings and present measurements of the optical properties of silicon at millimeter wavelengths at cryogenic and room temperatures. This coating and lens fabrication approach is applicable from centimeter to submillimeter wavelengths and can be used to fabricate coatings with greater than octave bandwidth.

  12. Anti-Reflective and Waterproof Hard Coating for High Power Laser Optical Elements

    NASA Astrophysics Data System (ADS)

    Murahara, Masataka; Yabe, Takashi; Uchida, Shigeaki; Yoshida, Kunio; Okamoto, Yoshiaki

    2006-05-01

    A hard coating method of single crystalline porous silica film is widely used for high power laser optical elements in the air. However, there is no protective hard coating method for the elements to survive high power laser irradiance while in the water. We, thus, developed a new method for a waterproof coating with photo-oxidation of silicone oil. The silicone oil was spin-coated onto the surface of optical elements, and then irradiated with a xenon excimer lamp in the air. In this treatment, a protective coating for plastic lenses, mirrors, and nonlinear optical crystals, which are highly deliquescent, was developed by taking advantage of the phenomenon in which organic silicone oil is transformed to inorganic amorphous glass by a process of photo-oxidation. This technique has enabled an optical thin coating film to transmit ultraviolet rays of wavelengths under 200 nm and possess the characteristics of homogeneity, high density, resistance to environment, anti-reflectiveness, resistance to water, and Mohs' scale of 5, which is comparable to apatite. This allows us to cool a slab laser head and use as a mirror for underwater laser welding.

  13. Monolithic graded-refractive-index glass-based antireflective coatings. Broadband/omnidirectional light harvesting and self-cleaning characteristics

    DOE PAGESBeta

    Aytug, Tolga; Lupini, Andrew R.; Jellison, Gerald E.; Joshi, Pooran C.; Ivanov, Ilia H.; Liu, Tao; Wang, Peng; Menon, Rajesh; Trejo, Rosa M.; Lara-Curzio, Edgar; et al

    2015-04-23

    The design of multifunctional coatings impact impact the performance of many optical systems and components. Such coatings should be mechanically robust, and combine user-defined optical and wetting functions with scalable fabrication formulations. By taking cues from the properties of some natural biological structures, we report here the formation of low-refractive index antireflective glass films that embody omni-directional optical properties over a wide range of wavelengths, while also possessing specific wetting capabilities. The coatings comprise an interconnected network of nanoscale pores surrounded by a nanostructured silica framework. These structures result from a novel fabrication method that utilizes metastable spinodal phase separationmore » in glass-based materials. The approach not only enables design of surface microstructures with graded-index antireflection characteristics, where the surface reflection is suppressed through optical impedance matching between interfaces, but also facilitates self-cleaning ability through modification of the surface chemistry. Based on near complete elimination of Fresnel reflections (yielding >95% transmission through a single-side coated glass) and corresponding increase in broadband transmission, the fabricated nanostructured surfaces are found to promote a general and an invaluable ~3–7% relative increase in current output of multiple direct/indirect bandgap photovoltaic cells. Moreover, these antireflective surfaces also demonstrate superior resistance against mechanical wear and abrasion. Unlike conventional counterparts, the present antireflective coatings are essentially monolithic, enabling simultaneous realization of graded index anti-reflectivity, self-cleaning capability, and mechanical stability within the same surface. Moreover, the concept represents a fundamental basis for development of advanced coated optical quality products, especially where environmental exposure is required.« less

  14. Monolithic graded-refractive-index glass-based antireflective coatings. Broadband/omnidirectional light harvesting and self-cleaning characteristics

    SciTech Connect

    Aytug, Tolga; Lupini, Andrew R.; Jellison, Gerald E.; Joshi, Pooran C.; Ivanov, Ilia H.; Liu, Tao; Wang, Peng; Menon, Rajesh; Trejo, Rosa M.; Lara-Curzio, Edgar; Hunter, Scott R.; Simpson, John T.; Paranthaman, M. Parans; Christen, David K.

    2015-04-23

    The design of multifunctional coatings impact impact the performance of many optical systems and components. Such coatings should be mechanically robust, and combine user-defined optical and wetting functions with scalable fabrication formulations. By taking cues from the properties of some natural biological structures, we report here the formation of low-refractive index antireflective glass films that embody omni-directional optical properties over a wide range of wavelengths, while also possessing specific wetting capabilities. The coatings comprise an interconnected network of nanoscale pores surrounded by a nanostructured silica framework. These structures result from a novel fabrication method that utilizes metastable spinodal phase separation in glass-based materials. The approach not only enables design of surface microstructures with graded-index antireflection characteristics, where the surface reflection is suppressed through optical impedance matching between interfaces, but also facilitates self-cleaning ability through modification of the surface chemistry. Based on near complete elimination of Fresnel reflections (yielding >95% transmission through a single-side coated glass) and corresponding increase in broadband transmission, the fabricated nanostructured surfaces are found to promote a general and an invaluable ~3–7% relative increase in current output of multiple direct/indirect bandgap photovoltaic cells. Moreover, these antireflective surfaces also demonstrate superior resistance against mechanical wear and abrasion. Unlike conventional counterparts, the present antireflective coatings are essentially monolithic, enabling simultaneous realization of graded index anti-reflectivity, self-cleaning capability, and mechanical stability within the same surface. Moreover, the concept represents a fundamental basis for development of advanced coated optical quality products, especially where environmental exposure is required.

  15. Comparisons between laser damage and optical electric field behaviors for hafnia/silica antireflection coatings

    SciTech Connect

    Bellum, John; Kletecka, Damon; Rambo, Patrick; Smith, Ian; Schwarz, Jens; Atherton, Briggs

    2011-03-20

    We compare designs and laser-induced damage thresholds (LIDTs) of hafnia/silica antireflection (AR) coatings for 1054 nm or dual 527 nm/1054 nm wavelengths and 0 deg. to 45 deg. angles of incidence (AOIs). For a 527 nm/1054 nm, 0 deg. AOI AR coating, LIDTs from three runs arbitrarily selected over three years are {approx}20 J/cm{sup 2} or higher at 1054 nm and <10 J/cm{sup 2} at 527 nm. Calculated optical electric field intensities within the coating show two intensity peaks for 527 nm but not for 1054 nm, correlating with the lower (higher) LIDTs at 527 nm (1054 nm). For 1054 nm AR coatings at 45 deg. and 32 deg. AOIs and S and P polarizations (Spol and Ppol), LIDTs are high for Spol (>35 J/cm{sup 2}) but not as high for Ppol (>30 J/cm{sup 2} at 32 deg. AOI; {approx}15 J/cm{sup 2} at 45 deg. AOI). Field intensities show that Ppol discontinuities at media interfaces correlate with the lower Ppol LIDTs at these AOIs. For Side 1 and Side 2 dual 527 nm/1054 nm AR coatings of a diagnostic beam splitter at 22.5 deg. AOI, Spol and Ppol LIDTs (>10 J/cm{sup 2} at 527 nm; >35 J/cm{sup 2} at 1054 nm) are consistent with Spol and Ppol intensity behaviors.

  16. Evaporation of uniform antireflection coatings on hemispherical lenses to enhance infrared antenna gain

    NASA Astrophysics Data System (ADS)

    Slovick, Brian A.; Krenz, Peter M.; Zummo, Guy; Boreman, Glenn D.

    2010-03-01

    Infrared dipole-coupled bolometers receive radiation more efficiently when illuminated through a high permittivity, antireflection (AR) coated, hemispherical immersion lens. To maintain the enhanced responsivity for all illumination angles, the AR coating must be uniform over the hemispherical surface. An evaporation method for depositing a uniform AR coating on the hemispherical surface is presented. The lens is tilted relative to the source, which can be either electron-beam or thermal, and rotated throughout the deposition. Evaporation at an angle of 70° yields a uniform film with less than 10% thickness variation over a 120° full angle of the hemispherical surface. A theoretical model is developed and compared to profilometer measurements. In all cases, there is general agreement between theory and measurement. A single dipole is fabricated onto the flat surface of an AR-coated germanium immersion lens and the responsivity is measured for both substrate-side and air-side illumination. With a zinc sulfide (ZnS) single-layer AR coating, substrate-side illumination yields a broadside antenna response 49 ± 2.7 times greater than air-side illumination.

  17. Broadband durable antireflection coating for an E-O system window having multiple-wavelength applications

    NASA Astrophysics Data System (ADS)

    Hasan, Wasim; Bui, Hoa T.

    1992-12-01

    Conventional ZnS, clear ZnS, ZnSe, and ZnS/ZnSe sandwich materials along with 8 to 12 micrometers anti-reflection (AR) coatings have been used as windows for forward looking infrared (FLIR) thermal imaging electro-optical sensors (such as those incorporated on PAVE TACK, F-18, and LANTIRN pods). Conventional ZnS also has been used as dome material for IR Maverick missiles and other missile applications. All of these systems have separate windows/systems for target designation, rangefinding, and low light level television (LLLTV) applications. New generation system require that a single window provide multispectral capabilities to perform various functions. A graded index AR coating developed at Hughes Danbury Optical Systems (HDOS) provides the multispectral capabilities and is highly durable for subsonic aircraft and missile applications. The spectral performance, durability, rain- erosion, and some sand and dust data of such a coating are presented in this paper. The data is also presented for this coating in conjunction with grids for EMI attenuation. The transmission of the coating as a function angle of incidence is also presented.

  18. The Broadband Anti-reflection Coated Extended Hemispherical Silicon Lenses for uc(Polarbear-2) Experiment

    NASA Astrophysics Data System (ADS)

    Siritanasak, P.; Aleman, C.; Arnold, K.; Cukierman, A.; Hazumi, M.; Kazemzadeh, K.; Keating, B.; Matsumura, T.; Lee, A. T.; Lee, C.; Quealy, E.; Rosen, D.; Stebor, N.; Suzuki, A.

    2015-12-01

    uc(Polarbear-2) (PB-2) is a next-generation receiver that is part of the Simons Array cosmic microwave background (CMB) polarization experiment which is located in the Atacama desert in Northern Chile. The primary scientific goals of the Simons Array are a deep search for the CMB B-mode signature of gravitational waves from inflation and the characterization of large-scale structure using its effect on CMB polarization. The PB-2 receiver will deploy with 1897 dual-polarization sinuous antenna-coupled pixels, each with a directly contacting extended hemispherical silicon lens. Every pixel has dual polarization sensitivity in two spectral bands centered at 95 and 150 GHz, for a total of 7588 transition edge sensor bolometers operating at 270 mK. To achieve the PB-2 detector requirements, we developed a broadband anti-reflection (AR) coating for the extended hemispherical lenses that uses two molds to apply two layers of epoxy, Stycast 1090 and Stycast 2850FT. Our measurements of the absorption loss from the AR coating on a flat surface at cryogenic temperatures show less than 1 % absorption, and the coating has survived multiple thermal cycles. We can control the diameter of the coating within 25 \\upmu m and translation errors are within 25 \\upmu m in all directions, which results in less than 1 % decrease in transmittance. We also find the performance of the AR-coated lens matches very well with simulations.

  19. The Broadband Anti-reflection Coated Extended Hemispherical Silicon Lenses for Polarbear-2 Experiment

    NASA Astrophysics Data System (ADS)

    Siritanasak, P.; Aleman, C.; Arnold, K.; Cukierman, A.; Hazumi, M.; Kazemzadeh, K.; Keating, B.; Matsumura, T.; Lee, A. T.; Lee, C.; Quealy, E.; Rosen, D.; Stebor, N.; Suzuki, A.

    2016-08-01

    Polarbear-2 (PB-2) is a next-generation receiver that is part of the Simons Array cosmic microwave background (CMB) polarization experiment which is located in the Atacama desert in Northern Chile. The primary scientific goals of the Simons Array are a deep search for the CMB B-mode signature of gravitational waves from inflation and the characterization of large-scale structure using its effect on CMB polarization. The PB-2 receiver will deploy with 1897 dual-polarization sinuous antenna-coupled pixels, each with a directly contacting extended hemispherical silicon lens. Every pixel has dual polarization sensitivity in two spectral bands centered at 95 and 150 GHz, for a total of 7588 transition edge sensor bolometers operating at 270 mK. To achieve the PB-2 detector requirements, we developed a broadband anti-reflection (AR) coating for the extended hemispherical lenses that uses two molds to apply two layers of epoxy, Stycast 1090 and Stycast 2850FT. Our measurements of the absorption loss from the AR coating on a flat surface at cryogenic temperatures show less than 1 % absorption, and the coating has survived multiple thermal cycles. We can control the diameter of the coating within 25 {\\upmu }m and translation errors are within 25 {\\upmu }m in all directions, which results in less than 1 % decrease in transmittance. We also find the performance of the AR-coated lens matches very well with simulations.

  20. An experimental study of antireflective coatings in Ge light detectors for scintillating bolometers

    NASA Astrophysics Data System (ADS)

    Mancuso, M.; Beeman, J. W.; Giuliani, A.; Dumoulin, L.; Olivieri, E.; Pessina, G.; Plantevin, O.; Rusconi, C.; Tenconi, M.

    2014-01-01

    Luminescent bolometers are double-readout devices able to measure simultaneously the phonon and the light yields after a particle interaction in the detector. This operation allows in some cases to tag the type of the interacting quantum, crucial issue for background control in rare event experiments such as the search for neutrinoless double beta decay and for interactions of particle dark matter candidates. The light detectors used in the LUCIFER and LUMINEU searches (projects aiming at the study of the double beta interesting candidates 82Se and 100Mo using ZnSe and ZnMoO4 scintillating bolometers) consist of hyper-pure Ge thin slabs equipped with NTD thermistors. A substantial sensitivity improvement of the Ge light detectors can be obtained applying a proper anti-reflective coatings on the Ge side exposed to the luminescent bolometer. The present paper deals with the investigation of this aspect, proving and quantifying the positive effect of a SiO2 and a SiO coating and setting the experimental bases for future tests of other coating materials. The results confirm that an appropriate coating procedure helps in improving the sensitivity of bolometric light detectors by an important factor (in the range 20% - 35%) and needs to be included in the recipe for the development of an optimized radio-pure scintillating bolometer.

  1. Titanium dioxide antireflection coating for silicon solar cells by spray deposition

    NASA Technical Reports Server (NTRS)

    Kern, W.; Tracy, E.

    1980-01-01

    A high-speed production process is described for depositing a single-layer, quarter-wavelength thick antireflection coating of titanium dioxide on metal-patterned single-crystal silicon solar cells for terrestrial applications. Controlled atomization spraying of an organotitanium solution was selected as the most cost-effective method of film deposition using commercial automated equipment. The optimal composition consists of titanium isopropoxide as the titanium source, n-butyl acetate as the diluent solvent, sec-butanol as the leveling agent, and 2-ethyl-1-hexanol to render the material uniformly depositable. Application of the process to the coating of circular, large-diameter solar cells with either screen-printed silver metallization or with vacuum-evaporated Ti/Pd/Ag metallization showed increases of over 40% in the electrical conversion efficiency. Optical characteristics, corrosion resistance, and several other important properties of the spray-deposited film are reported. Experimental evidence indicates a wide tolerance in the coating thickness upon the overall efficiency of the cell. Considerations pertaining to the optimization of AR coatings in general are discussed, and a comprehensive critical survey of the literature is presented.

  2. Laser-induced damage behaviors of antireflective coatings at cryogenic condition.

    PubMed

    Wang, He; Zhang, Weili; He, Hongbo

    2012-12-20

    The laser-induced damage to antireflective coatings on Yb:YAG crystals under different temperatures was investigated. An optical profiler, field-emission scanning-electron microscopy, and a step profiler were used to determine the damage morphology, including size and depth. The results show that there is about 5 J/cm(2) decrease in the laser-induced damage threshold of cryogenic conditions compared to that of room temperature in 1-on-1 test mode, and a 3 J/cm(2) decrease in 100-on-1 mode. There is an accumulation effect in both cases. Meanwhile, the damage areas and depths are also much larger under cryogenic conditions. The precipitation of the subsurface defects in the substrate and the thermal stress in the interface between the film and the substrate under cryogenic conditions are considered to be the key factors in the unique damage behaviors. PMID:23262610

  3. Antireflection coatings for deep ultraviolet optics deposited by magnetron sputtering from Al targets.

    PubMed

    Liao, Bo-Huei; Lee, Cheng-Chung

    2011-04-11

    We introduce an innovative technique for the deposition of fluorine doped oxide (F:Al(2)O(3)) films by DC pulse magnetron sputtering from aluminum targets at room temperature. There was almost no change in transmittance even after the film was exposed to air for two weeks. Its refractive index was around 1.69 and the extinction coefficient was smaller than 1.9 × 10(-4) at 193 nm. An AlF(3)/F:Al(2)O(3) antireflection coating was deposited on both sides of a quartz substrate. A high transmittance of 99.32% was attained at the 193 nm wavelength. The cross-sectional morphology showed that the surface of the multilayer films was smooth and there were no columnar or porous structures. PMID:21503058

  4. Highly transparent triboelectric nanogenerator for harvesting water-related energy reinforced by antireflection coating

    NASA Astrophysics Data System (ADS)

    Liang, Qijie; Yan, Xiaoqin; Gu, Yousong; Zhang, Kui; Liang, Mengyuan; Lu, Shengnan; Zheng, Xin; Zhang, Yue

    2015-03-01

    Water-related energy is an inexhaustible and renewable energy resource in our environment, which has huge amount of energy and is not largely dictated by daytime and sunlight. The transparent characteristic plays a key role in practical applications for some devices designed for harvesting water-related energy. In this paper, a highly transparent triboelectric nanogenerator (T-TENG) was designed to harvest the electrostatic energy from flowing water. The instantaneous output power density of the T-TENG is 11.56 mW/m2. Moreover, with the PTFE film acting as an antireflection coating, the maximum transmittance of the fabricated T-TENG is 87.4%, which is larger than that of individual glass substrate. The T-TENG can be integrated with silicon-based solar cell, building glass and car glass, which demonstrates its potential applications for harvesting waste water energy in our living environment and on smart home system and smart car system.

  5. Indium doped zinc oxide nanowire thin films for antireflection and solar absorber coating applications

    SciTech Connect

    Shaik, Ummar Pasha; Krishna, M. Ghanashyam

    2014-04-24

    Indium doped ZnO nanowire thin films were prepared by thermal oxidation of Zn-In metal bilayer films at 500°C. The ZnO:In nanowires are 20-100 nm in diameter and several tens of microns long. X-ray diffraction patterns confirm the formation of oxide and indicate that the films are polycrystalline, both in the as deposited and annealed states. The transmission which is <2% for the as deposited Zn-In films increases to >90% for the ZnO:In nanowire films. Significantly, the reflectance for the as deposited films is < 10% in the region between 200 to 1500 nm and < 2% for the nanowire films. Thus, the as deposited films can be used solar absorber coatings while the nanowire films are useful for antireflection applications. The growth of nanowires by this technique is attractive since it does not involve very high temperatures and the use of catalysts.

  6. Characterization and simulation on antireflective coating of amorphous silicon oxide thin films with gradient refractive index

    NASA Astrophysics Data System (ADS)

    Huang, Lu; Jin, Qi; Qu, Xingling; Jin, Jing; Jiang, Chaochao; Yang, Weiguang; Wang, Linjun; Shi, Weimin

    2016-08-01

    The optical reflective properties of silicon oxide (SixOy) thin films with gradient refractive index are studied both theoretically and experimentally. The thin films are widely used in photovoltaic as antireflective coatings (ARCs). An effective finite difference time domain (FDTD) model is built to find the optimized reflection spectra corresponding to structure of SixOy ARCs with gradient refractive index. Based on the simulation analysis, it shows the variation of reflection spectra with gradient refractive index distribution. The gradient refractive index of SixOy ARCs can be obtained in adjustment of SiH4 to N2O ratio by plasma-enhanced chemical vapor deposition (PECVD) system. The optimized reflection spectra measured by UV-visible spectroscopy confirms to agree well with that simulated by FDTD method.

  7. Millimeter-wave broadband antireflection coatings using laser ablation of subwavelength structures.

    PubMed

    Matsumura, Tomotake; Young, Karl; Wen, Qi; Hanany, Shaul; Ishino, Hirokazu; Inoue, Yuki; Hazumi, Masashi; Koch, Jürgen; Suttman, Oliver; Schütz, Viktor

    2016-05-01

    We report on the first use of laser ablation to make submillimeter, broadband, antireflection coatings (ARCs) based on subwavelength structures (SWSs) on alumina and sapphire. We used a 515 nm laser to produce pyramid-shaped structures with a pitch of about 320 μm and a total height of near 800 μm. Transmission measurements between 70 and 140 GHz are in agreement with simulations using electromagnetic propagation software. The simulations indicate that SWS-ARCs with the fabricated shape should have a fractional bandwidth response of Δν/νcenter=0.55 centered on 235 GHz for which reflections are below 3%. Extension of the bandwidth to both lower and higher frequencies, between a few tens of gigahertz and a few terahertz, should be straightforward with appropriate adjustment of laser ablation parameters. PMID:27140362

  8. Preparation of a Functionally Graded Fluoropolymer Thin Film and Its Application to Antireflective Coating

    NASA Astrophysics Data System (ADS)

    Senda, Kazuo; Matsuda, Tsuyoshi; Kawanishi, Takumi; Tanaka, Kuniaki; Usui, Hiroaki

    2013-05-01

    Fluoropolymer thin films were prepared by the ion-assisted vapor deposition polymerization (IAD) of 2-(perfluorohexyl) ethylacrylate (Rf-6) under Ar ion irradiation. The ion acceleration voltage Va largely affected the film characteristics. With increasing Va, the adhesion strength between the film and the substrate improved, while the surface energy and the refractive index increased. To attain a high adhesion strength, a low surface energy, and a low optical reflectivity simultaneously, a functionally graded film was prepared by varying Va from 300 to 0 V continually in the course of film growth. As a consequence, an antireflective coating with good adhesion and low surface energy was obtained. The optical reflectivity of a glass substrate was reduced from 4.9 to 0.55% at a wavelength of 400 nm by depositing a 100-nm-thick single-layer functionally graded fluoropolymer film. The surface energy of this film was 8.5 mJ/m2.

  9. Three-layer antireflection coatings - A new method for design and optimization

    NASA Astrophysics Data System (ADS)

    Nagendra, C. L.; Thutupalli, G. K. M.

    1983-12-01

    An algorithm offering a simpler and faster optimization procedure is developed for the design of multilayer antireflection coatings, and a closed-loop nonlinear approximation technique is used to arrive at the exact thickness of each layer. The method has been used in the design of systems with high- and low-index substrates normally used in IR regions and in visible to near-IR regions, respectively. In a comparative study with other techniques the present design was preferred over Dobrowolski's (1981, 1982) if a wider spectral bandwidth is of more importance than spectral losses. The use of this method permits optimum design with refinement in only one thickness. This non-lambda/4 system gives higher flexibility in choosing the refractive index of the materials and correcting the system in in-situ conditions.

  10. New generation of bottom anti-reflective coatings (BARCs): photodefinable BARCs

    NASA Astrophysics Data System (ADS)

    Guerrero, Douglas J.; Trudgeon, Tonya

    2003-06-01

    Three polymer systems, polycarbonates, polysulfonyl esters, and hybrid carbonate-sulfones, were evaluated as materials for a new generation of bottom anti-reflective coatings (BARCs). The polymers were tested for their solubility in accepted industry solvents, resistance to photoresist solvents after casting, thermal stability, and photosensitivity. From these, polysulfonyl esters show more promising properties as photodefinable BARCs than the other systems because of their good solvent solubility and resistance to photoresist solvents after casting. These polymers can be formulated in ethyl lactate (EL) or 1-methoxy-2-acetoxypropane (PGMEA) but are insoluble in the same solvents after curing above 170°C. The polysulfonyl esters were thermally stable up to ~300°C in air. The cured films were exposed with DUV light at 200 to 600 mJ/cm2. After exposure, the films can be easily removed in alkaline developer.

  11. Optical breathing of nano-porous antireflective coatings through adsorption and desorption of water.

    PubMed

    Nielsen, Karsten H; Kittel, Thomas; Wondraczek, Katrin; Wondraczek, Lothar

    2014-01-01

    We report on the direct consequences of reversible water adsorption on the optical performance of silica-based nanoporous antireflective (AR) coatings as they are applied on glass in photovoltaic and solar thermal energy conversion systems. In situ UV-VIS transmission spectroscopy and path length measurements through high-resolution interferometric microscopy were conducted on model films during exposure to different levels of humidity and temperature. We show that water adsorption in the pores of the film results in a notable increase of the effective refractive index of the coating. As a consequence, the AR effect is strongly reduced. The temperature regime in which the major part of the water can be driven-out rapidly lies in the range of 55°C and 135°C. Such thermal desorption was found to increase the overall transmission of a coated glass by ~ 1%-point. As the activation energy of isothermal desorption, we find a value of about 18 kJ/mol. Within the experimental range of our data, the sorption and desorption process is fully reversible, resulting in optical breathing of the film. Nanoporous AR films with closed pore structure or high hydrophobicity may be of advantage for maintaining AR performance under air exposure. PMID:25307536

  12. Optical breathing of nano-porous antireflective coatings through adsorption and desorption of water

    NASA Astrophysics Data System (ADS)

    Nielsen, Karsten H.; Kittel, Thomas; Wondraczek, Katrin; Wondraczek, Lothar

    2014-10-01

    We report on the direct consequences of reversible water adsorption on the optical performance of silica-based nanoporous antireflective (AR) coatings as they are applied on glass in photovoltaic and solar thermal energy conversion systems. In situ UV-VIS transmission spectroscopy and path length measurements through high-resolution interferometric microscopy were conducted on model films during exposure to different levels of humidity and temperature. We show that water adsorption in the pores of the film results in a notable increase of the effective refractive index of the coating. As a consequence, the AR effect is strongly reduced. The temperature regime in which the major part of the water can be driven-out rapidly lies in the range of 55°C and 135°C. Such thermal desorption was found to increase the overall transmission of a coated glass by ~ 1%-point. As the activation energy of isothermal desorption, we find a value of about 18 kJ/mol. Within the experimental range of our data, the sorption and desorption process is fully reversible, resulting in optical breathing of the film. Nanoporous AR films with closed pore structure or high hydrophobicity may be of advantage for maintaining AR performance under air exposure.

  13. Optical breathing of nano-porous antireflective coatings through adsorption and desorption of water

    PubMed Central

    Nielsen, Karsten H.; Kittel, Thomas; Wondraczek, Katrin; Wondraczek, Lothar

    2014-01-01

    We report on the direct consequences of reversible water adsorption on the optical performance of silica-based nanoporous antireflective (AR) coatings as they are applied on glass in photovoltaic and solar thermal energy conversion systems. In situ UV-VIS transmission spectroscopy and path length measurements through high-resolution interferometric microscopy were conducted on model films during exposure to different levels of humidity and temperature. We show that water adsorption in the pores of the film results in a notable increase of the effective refractive index of the coating. As a consequence, the AR effect is strongly reduced. The temperature regime in which the major part of the water can be driven-out rapidly lies in the range of 55°C and 135°C. Such thermal desorption was found to increase the overall transmission of a coated glass by ~ 1%-point. As the activation energy of isothermal desorption, we find a value of about 18 kJ/mol. Within the experimental range of our data, the sorption and desorption process is fully reversible, resulting in optical breathing of the film. Nanoporous AR films with closed pore structure or high hydrophobicity may be of advantage for maintaining AR performance under air exposure. PMID:25307536

  14. Effect of substrate index of refraction on the design of antireflection coatings

    NASA Astrophysics Data System (ADS)

    Willey, Ronald R.

    2011-09-01

    Formulae to estimate the average percent reflectance (Rave) of a broadband antireflection (AR) coating as a function of the bandwidth (B), the overall thickness (C), the index of refraction of the last layer (L), and the difference between the indices of the high- and low-index layers (D) were reported in 1991. Various refinements of these formulae and other insights into the underlying behavior of such coating designs have been reported up until the present time. Dobrowolski, et al.6 and Tikhonravov, et al.7 have also added independent viewpoints to this subject over this period. In the previous studies, the effects of the index of refraction of the substrate have mostly been ignored and have appeared to be very minor. This study has investigated the influence of the substrate index on the Rave results. It has been found that there seem to be two classes of designs with respect to the effect of substrate index. In the class of "step down" AR designs, there is a significant effect, in the other class, there is no significant effect. Even in the step-down case, there is no effect of substrate index if any and all indices of refraction for the coating materials are available from that of the index of the substrate to the index of the media.

  15. Broadband anti-reflective and water-repellent coatings on glass substrates for self-cleaning photovoltaic cells

    SciTech Connect

    Li, Xiaoyu; He, Junhui; Liu, Weiyi

    2013-07-15

    Graphical abstract: High performance broadband antireflective and water-repellent coatings were fabricated on glass substrates, which can improve the short-circuit current of solar cells as much as 6.6% in comparison with glass substrates without the coatings. - Highlights: • Broadband anti-reflective and water-repellent coatings were fabricated. • Transmittance increased to 99.0%, significantly higher than that of commercial solar glasses. • The performance of standard solar cells with the AR coating was enhanced as much as 6.6%. - Abstract: High performance broadband antireflective (AR) and water-repellent coatings were fabricated on glass substrates by assembly of silica nanoparticles and polyelectrolytes via the layer-by-layer (LbL) assembly technique, followed by calcination and hydrophobic modification. A porous poly(diallyladimethylammonium chloride) (PDDA)/20 nm SiO{sub 2} nanoparticles (S-20) multilayer coating with AR property was prepared first. The maximum transmittance is as high as 99.0%, while that of the glass substrate is only 91.3%. After calcination and hydrophobic modification, the coating became water-repellent while maintaining the good AR property. Such water-repellent AR coatings can improve the short-circuit current of solar cells as much as 6.6% in comparison with glass substrates without the coatings. Scanning electron microscopy (SEM) was used to observe the morphology and thickness of coatings. Transmission spectra and reflection spectra were characterized by UV–vis spectrophotometer. The surface wettability was studied by a contact angle/interface system.

  16. Infrared durable protective/antireflection coatings with high performance on Ge and Si substrates

    NASA Astrophysics Data System (ADS)

    Yao, XiLin; Xiong, ChangXin; Yang, ChangCheng; Tong, NanChun

    2006-02-01

    Firstly, a reverse synthesis method is outlined for the determination of the optical constants of infrared coatings from transmittance spectrum data by optimizing the physical thickness, refractive index and extinction coefficient, which can apply to all kinds of transmission spectra and do not rely on the existence of interference fringe patterns and the absorption of substrates. A lot of deposition experiments with the ion-assisted deposition (IAD) technique have firstly done about infrared optical materials ZnS, YF3, Ge and DLC (diamond-like-carbon), in order to obtain high dense and low absorbance layers in the 3-5μm and 8-12μm spectral windows. Using the reverse synthesis method, the refractive index and extinction coefficient of these materials have been obtained accurately. The appropriate deposition parameters and the problems from the deposition process are in detail discussed in this paper. YF3 has been then associated with ZnS and Ge layers so as to obtain antireflection coatings with high performance on Ge and Si substrates in 3-5μm and/or 8-12μm range. In addition, a novel multi-layer infrared AR coating utilizing DLC film as one of the low index films has also been developed for Si and Ge substrates. The optical performance is satisfied (average transmittance is no less than 97%, maximum transmittance is more than 98%, from 8μm to 11.5μm), which is better than that of a single film of one quarterwave DLC coating with interior surface multi-layer AR coated on Ge substrates. However, the adhesion between multi-layer AR coatings and DLC coating is not well, leading to coatings falling off from substrates after humidity test and moderate abrasion test, according to MIL-F-48497. Through a lot of experiments, a non-absorbing coating material has been found as bonding layer to solve this problem. The optical properties of three kinds of infrared coatings and the environmental and physical durability test results including high/low temperature test

  17. Responsivity enhancement of mid-infrared PbSe detectors using CaF2 nano-structured antireflective coatings

    NASA Astrophysics Data System (ADS)

    Weng, Binbin; Qiu, Jijun; Yuan, Zijian; Larson, Preston R.; Strout, Gregory W.; Shi, Zhisheng

    2014-01-01

    The CaF2 nano-structures grown by thermal vapor deposition are presented. Significant responsivity improvement (>200%) of mid-infrared PbSe detectors incorporating a 200 nm nano-structured CaF2 coating was observed. The detector provides a detectivity of 4.2 × 1010 cm . Hz1/2/W at 3.8 μm, which outperforms all the reported un-cooled PbSe detectors. Structural investigations show that the coating is constructed by tapered-shape nanostructures, which creates a gradient refractive-index profile. Analogy to moth-eye antireflective mechanism, the gradient refractive-index nanostructures play the major roles for this antireflection effect. Some other possible mechanisms that help enhance the device performance are also discussed in the work.

  18. Broadband terahertz absorption enabled by coating an ultrathin antireflection film on doped semiconductor.

    PubMed

    Wu, Hongxing; Shi, Fenghua; Chen, Yihang

    2016-09-01

    We show that perfect absorption of terahertz wave can be achieved in a compact system where an ultrathin film of lossless dielectric is coated on a doped semiconductor substrate. Due to the nontrivial reflection phase shift at the interface between the two media, strong resonant behavior and the concomitant antireflection occur at wavelengths that are much larger than the thickness of the dielectric film, resulting in strong absorption of the incident wave in a wide frequency range. Using this mechanism, we design a broadband terahertz absorber by coating a Ge film on a highly doped GaAs substrate. We show that such a system not only has a perfect absorption peak, but also exhibits high absorptance (over 0.9) within a fractional bandwidth of over 20%. By varying the free carrier density in the GaAs substrate, the central frequency of the absorption band can be tuned from 1.79 to 2.69 THz. In addition, the absorption performance of the proposed system is shown to be insensitive to both incident angle and polarization. Our results offer a low-cost way for the design of absorption-based THz devices. PMID:27607670

  19. Process development and impurities analysis for the bottom antireflective coating material

    NASA Astrophysics Data System (ADS)

    Ko, Fu-Hsiang; Chen, Hsuen-Li; Huang, Tiao-Yuan; Cheng, Hsu-Chun; Ko, Chu-Jung; Chu, Tieh-Chi

    2001-08-01

    The optical behavior of semiconductor bottom antireflective coating (BARC) material was investigated by both the measurement and simulation methods. The effects of spin- coating rate, interface reflection, BARC layer thickness and photoresist layer thickness were studied. Our results indicated that the 62.5 nm of BARC layer had strong effect on suppressing the light reflection of wavelength of 248 nm form the wafer surface, irrespective of the photoresist layer thickness. Based on the gravimetric method, a high throughput and one-step microwave digestion procedure was developed for the BARC materials. The digestion efficiency increased with the digestion duration and the temperature. By following the established one-step microwave digestion method and inductively coupled plasma mass spectrometry determination, the detection limits obtained for Cr, Ni, Cu, An and Pb were in 0.1 to 1.11 ppb levels. The spike recoveries of the metallic impurities were in the range 86- 102% for the BARC materials. The analytical results of the BARC samples were found to be in reasonably good agreement with our previous method, and the analytical throughput can achieve up to 20 samples per hour for the analysis of 5 elements.

  20. Antireflective Coatings using Layer-by-Layer Self Assembly of Silica and Titania Nanoparticles

    NASA Astrophysics Data System (ADS)

    Velasco Castedo, Raisa; Lal, Anitesh Anand; Mazilu, Dan

    2011-03-01

    It is known that glass substrates (borosilicate glass) reflect about 4% of light at each air/glass interface and thus, they transmit only 92% of light. For some devices like camera lenses, it is important to maximize the amount of transmitted light. Previous research has demonstrated that it is possible to do so by adding antireflective coatings to the substrates. Our research aimed to deposit thin films on glass substrates that would minimize the reflectance of light and thus, maximize its transmittance. The thin films consisted of multiple alternating layers of silica and titania nanoparticles following the theory behind double-quarter periodic systems and were deposited on the substrates via the ISAM (ionically self-assembled monolayers) technique. Several experiments were conducted in order to investigate the factors that affected the quality of the coatings and some of the significant factors observed were the pH and the molarity of the silica, titania and PDDA solutions. A number of factor-level combinations yielded transmittances in excess of 96%, well above the value for uncoated substrates. R.E.Lee Summer Research Program at Washington and Lee University.

  1. The POLARBEAR Cosmic Microwave Background Polarization Experiment and Anti-Reflection Coatings for Millimeter Wave Observations

    NASA Astrophysics Data System (ADS)

    Quealy, Erin Elizabeth

    polarized reflections off of the refractive optics inside the receiver. Specifically, the antenna-coupled detector scheme relies on a high dielectric lenslet for each pixel on the focal plane. A large portion of this thesis discusses development of anti-reflection (AR) coatings for the high curvature lenslet surface. The AR coating technologies discussed are also applicable to other optical elements, such as reimaging lenses and half-wave plates. A single layer coating is used on the pbone lenslet array, and a two layer coating is presented for use in pbtwo. The two layer coating method can be extended to wider bandwidth AR coatings.

  2. Impact of different cleaning processes on the laser damage threshold of antireflection coatings for Z-Backlighter optics at Sandia National Laboratories

    SciTech Connect

    Field, Ella; Bellum, John; Kletecka, Damon

    2014-11-06

    We have examined how different cleaning processes affect the laser-induced damage threshold of antireflection coatings for large dimension, Z-Backlighter laser optics at Sandia National Laboratories. Laser damage thresholds were measured after the coatings were created, and again 4 months later to determine which cleaning processes were most effective. There is a nearly twofold increase in laser-induced damage threshold between the antireflection coatings that were cleaned and those that were not cleaned. Aging of the coatings after 4 months resulted in even higher laser-induced damage thresholds. Also, the laser-induced damage threshold results revealed that every antireflection coating had a high defect density, despite the cleaning process used, which indicates that improvements to either the cleaning or deposition processes should provide even higher laser-induced damage thresholds.

  3. Impact of different cleaning processes on the laser damage threshold of antireflection coatings for Z-Backlighter optics at Sandia National Laboratories

    DOE PAGESBeta

    Field, Ella; Bellum, John; Kletecka, Damon

    2014-11-06

    We have examined how different cleaning processes affect the laser-induced damage threshold of antireflection coatings for large dimension, Z-Backlighter laser optics at Sandia National Laboratories. Laser damage thresholds were measured after the coatings were created, and again 4 months later to determine which cleaning processes were most effective. There is a nearly twofold increase in laser-induced damage threshold between the antireflection coatings that were cleaned and those that were not cleaned. Aging of the coatings after 4 months resulted in even higher laser-induced damage thresholds. Also, the laser-induced damage threshold results revealed that every antireflection coating had a high defectmore » density, despite the cleaning process used, which indicates that improvements to either the cleaning or deposition processes should provide even higher laser-induced damage thresholds.« less

  4. Modification Pathways for Copoly(2-oxazoline)s Enabling Their Application as Antireflective Coatings in Photolithography.

    PubMed

    Fimberger, Martin; Behrendt, Andreas; Jakopic, Georg; Stelzer, Franz; Kumbaraci, Volkan; Wiesbrock, Frank

    2016-02-01

    Chromophore-functionalized copoly(2-oxazoline)s are successfully evaluated as bottom antireflective coatings (BARCs) in high-resolution photolithography. With respect to UV light sources used in photolithographic production routines, anthracene is chosen as a chromophore. For application as polymer in BARCs, the copolymer poly(2-ethyl-2-oxazolin)45 -stat-poly(2-dec-9'-enyl-2-oxazolin)20 -stat-poly(2-(3'-(1"-(anthracen-9-ylmethyl)-1",2",3"-triazol-4-yl)propyl)-2-oxazolin)35 can be synthesized by the Huisgen cycloaddition click reaction of the copolymer poly(2-ethyl-2-oxazolin)45 -stat-poly(2-dec-9'-enyl-2-oxazolin)20 -stat-poly(2-pent-4'-inyl-2-oxazolin)35 and the corresponding azide-functionalized anthracenes. These copolymers can be crosslinked by the thermally induced thiol-ene reaction involving the unsaturated C=C bonds of the poly(2-dec-9'-enyl-2-oxazoline) repetition units and a multifunctional thiol as crosslinker. Tests of this BARC in a clean room under production conditions reveal a significant decrease of the swing-curve of a chemically amplified positive photoresist by more than 50%, hence significantly increasing the resolution of the photoresist. PMID:26619063

  5. Optimization of the antireflection coating of thin epitaxial crystalline silicon solar cells

    DOE PAGESBeta

    Selj, Josefine K.; Young, David; Grover, Sachit

    2015-08-28

    In this study we use an effective weighting function to include the internal quantum efficiency (IQE) and the effective thickness, Te, of the active cell layer in the optical modeling of the antireflection coating (ARC) of very thin crystalline silicon solar cells. The spectrum transmitted through the ARC is hence optimized for efficient use in the given cell structure and the solar cell performance can be improved. For a 2-μm thick crystalline silicon heterojunction solar cell the optimal thickness of the Indium Tin Oxide (ITO) ARC is reduced by ~8 nm when IQE data and effective thickness are taken intomore » account compared to the standard ARC optimization, using the AM1.5 spectrum only. The reduced ARC thickness will shift the reflectance minima towards shorter wavelengths and hence better match the absorption of very thin cells, where the short wavelength range of the spectrum is relatively more important than the long, weakly absorbed wavelengths. For this cell, we find that the optimal thickness of the ITO starts at 63 nm for very thin (1 μm) active Si layer and then increase with increasing Te until it saturates at 71 nm for Te > 30 μm.« less

  6. Highly transparent triboelectric nanogenerator for harvesting water-related energy reinforced by antireflection coating

    PubMed Central

    Liang, Qijie; Yan, Xiaoqin; Gu, Yousong; Zhang, Kui; Liang, Mengyuan; Lu, Shengnan; Zheng, Xin; Zhang, Yue

    2015-01-01

    Water-related energy is an inexhaustible and renewable energy resource in our environment, which has huge amount of energy and is not largely dictated by daytime and sunlight. The transparent characteristic plays a key role in practical applications for some devices designed for harvesting water-related energy. In this paper, a highly transparent triboelectric nanogenerator (T-TENG) was designed to harvest the electrostatic energy from flowing water. The instantaneous output power density of the T-TENG is 11.56 mW/m2. Moreover, with the PTFE film acting as an antireflection coating, the maximum transmittance of the fabricated T-TENG is 87.4%, which is larger than that of individual glass substrate. The T-TENG can be integrated with silicon-based solar cell, building glass and car glass, which demonstrates its potential applications for harvesting waste water energy in our living environment and on smart home system and smart car system. PMID:25765205

  7. Ga-doped ZnO conducting antireflection coatings for crystalline silicon solar cells

    NASA Astrophysics Data System (ADS)

    Estrich, N. A.; Hook, D. H.; Smith, A. N.; Leonard, J. T.; Laughlin, B.; Maria, J.-P.

    2013-06-01

    Transparent, conductive gallium-doped ZnO thin films are evaluated for application as conducting antireflection coatings (ARC) for crystalline silicon solar cells as a means to enhance efficiency by reducing the overall resistivity of the photovoltaic circuit. All Ga-doped ZnO thin films in this study were deposited using pulsed laser deposition. Synthesis conditions were first optimized for maximum electrical resistivity and minimal visible light absorption. The ideal combination contained 1 mol. % Ga doping and exhibited ˜90% transmission, with resistivity in the 1 × 10-3 ohm-cm range. Optimized films were prepared on reference flat silicon wafers with known dopant densities and on commercially obtained solar cell emitters without ARCs. Circular transmission line method measurements were used to measure specific contact resistivity (ρc). For n-type doped solar cell emitters, contact resistivity values of 0.1 mΩ cm2 were observed repeatedly. These values are consistent with, or lower than, contact resistivities associated with conventional silver paste metallization.

  8. Optimization of the antireflection coating of thin epitaxial crystalline silicon solar cells

    SciTech Connect

    Selj, Josefine K.; Young, David; Grover, Sachit

    2015-08-28

    In this study we use an effective weighting function to include the internal quantum efficiency (IQE) and the effective thickness, Te, of the active cell layer in the optical modeling of the antireflection coating (ARC) of very thin crystalline silicon solar cells. The spectrum transmitted through the ARC is hence optimized for efficient use in the given cell structure and the solar cell performance can be improved. For a 2-μm thick crystalline silicon heterojunction solar cell the optimal thickness of the Indium Tin Oxide (ITO) ARC is reduced by ~8 nm when IQE data and effective thickness are taken into account compared to the standard ARC optimization, using the AM1.5 spectrum only. The reduced ARC thickness will shift the reflectance minima towards shorter wavelengths and hence better match the absorption of very thin cells, where the short wavelength range of the spectrum is relatively more important than the long, weakly absorbed wavelengths. For this cell, we find that the optimal thickness of the ITO starts at 63 nm for very thin (1 μm) active Si layer and then increase with increasing Te until it saturates at 71 nm for Te > 30 μm.

  9. Highly transparent triboelectric nanogenerator for harvesting water-related energy reinforced by antireflection coating.

    PubMed

    Liang, Qijie; Yan, Xiaoqin; Gu, Yousong; Zhang, Kui; Liang, Mengyuan; Lu, Shengnan; Zheng, Xin; Zhang, Yue

    2015-01-01

    Water-related energy is an inexhaustible and renewable energy resource in our environment, which has huge amount of energy and is not largely dictated by daytime and sunlight. The transparent characteristic plays a key role in practical applications for some devices designed for harvesting water-related energy. In this paper, a highly transparent triboelectric nanogenerator (T-TENG) was designed to harvest the electrostatic energy from flowing water. The instantaneous output power density of the T-TENG is 11.56 mW/m(2). Moreover, with the PTFE film acting as an antireflection coating, the maximum transmittance of the fabricated T-TENG is 87.4%, which is larger than that of individual glass substrate. The T-TENG can be integrated with silicon-based solar cell, building glass and car glass, which demonstrates its potential applications for harvesting waste water energy in our living environment and on smart home system and smart car system. PMID:25765205

  10. Robust antireflection coatings By UV cross-linking of silica nanoparticles and diazo-resin polycation

    NASA Astrophysics Data System (ADS)

    Ridley, Jason I.; Heflin, James R.; Ritter, Alfred L.

    2007-09-01

    Antireflection coatings have been fabricated by self-assembly using silica nanoparticles. The ionic self-assembled multilayer (ISAM) films are tightly packed and homogeneous. While the geometric properties of a matrix of spherical particles with corresponding void interstices are highly suitable to meet the conditions for minimal reflectivity, it is also a cause for the lack of cohesion within the constituent body, as well as to the substrate surface. This study investigates methods for improving the interconnectivity of the nanoparticle structure. One such method involves UV curing of diazo-resin (DAR)/silica nanoparticle films, thereby converting the ionic interaction into a stronger covalent bond. Factorial analysis and response surface methods are incorporated to determine factors that affect film properties, and to optimize their optical and adhesive capabilities. The second study looks at the adhesive strength of composite multilayer films. Films are fabricated with silica nanoparticles and poly(allylamine hydrochloride) (PAH), and dipped into aqueous solutions of PAH and poly(methacrylic acid, sodium salt) (PMA) to improve cohesion of silica nanoparticles in the matrix, as well as binding strength to the substrate surface. The results of the two studies are discussed.

  11. Anti-reflection coatings for silicon solar cells from hydrogenated diamond like carbon

    NASA Astrophysics Data System (ADS)

    Das, Debajyoti; Banerjee, Amit

    2015-08-01

    Aiming towards a specific application as antireflection coatings (ARC) in Si solar cells, the growth of hydrogenated diamond like carbon (HDLC) films, by RF magnetron sputtering, has been optimized through comprehensive optical and structural studies. Various physical properties of the films e.g., (ID/IG) ratio in the Raman spectra, percentage of sp3 hybridization in XPS spectra, H-content in the network, etc., have been correlated with different ARC application properties e.g., transmittance, reflectance, optical band gap, refractive index, surface roughness, etc. The ARC properties have been optimized on unheated substrates, through systematic variations of RF power, gas flow rate, gas pressure and finally controlled introduction of hydrogen to the DLC network at its most favorable plasma parameters. The optimum HDLC films possess (T700)max ∼ 95.8%, (R700)min ∼ 3.87%, (n700)min ∼ 1.62 along with simultaneous (Eg)max ∼ 2.53 eV and ∼75.6% of sp3 hybridization in the C-network, corresponding to a bonded H-content of ∼23 at.%. Encouraging improvements in the ARC properties over the optimized DLC film were obtained with the controlled addition of hydrogen, and the optimum HDLC films appear quite promising for applications in Si solar cells. Systematic materials development has been performed through comprehensive understanding of the parameter space and its optimization, as elaborately discussed.

  12. Study of major factors to affect photoresist profile on developable bottom anti-reflective coating process

    NASA Astrophysics Data System (ADS)

    Roh, Hyo Jung; Ju, Dong Kyu; Kim, Hyun Jin; Kim, Jaehyun

    2011-04-01

    As critical dimensions continue to shrink in lithography, new materials will be needed to meet the new demands imposed by this shrinkage. Recently, there are needs for novel materials with various substrates and immersing process, including double patterning process, a high resolution implant process, and so on. Among such materials, Developable Bottom Anti-reflective Coating material (DBARC) is a good candidate for high resolution implant application as well as double patterning. DBARC should have reflectivity control function as an ordinary BARC, as well as an appropriate solubility in TMAH-based conventional developer after exposure and bake process. The most distinguished advantage of DBARC is to skip BARC etch process that is required in normal BARC process. In spite of this advantage, the photoresist profile on DBARC could be influenced by components and process conditions of DBARC. Several groups have tried to solve this issue to implement DBARC to new process. We have studied material-related factors affecting photoresist profiles, such as a polymer, photo-acid generators (PAGs), and additives. And we explored the effect of process condition for photoresist and DBARC. In case of polymer, we studied the effect of dissolution rate in developer and crosslinking functionality. For PAGs and additives, the effect of acid diffusivity and cross-linking degree according to their bulkiness were examined. We also evaluated coated film stability in a photoresist solvent after BARC bake process and compared lithographic performance of various DBARC formulations. In addition, the effect of photoresist profile with bake condition of photoresist and DBARC were investigated. In this paper, we will demonstrate the most influential factors of DBARC to photoresist profile and suggest the optimum formulation and process condition for DBARC application.

  13. Studies and testing of antireflective (AR) coatings for soda-lime glass

    NASA Technical Reports Server (NTRS)

    Pastirik, E. M.; Sparks, T. G.; Coleman, M. G.

    1978-01-01

    Processes for producing antireflection films on glass are concentrated in three areas: acid etching of glass, plasma etching of glass, and acid development of sodium silicate films on glass. The best transmission was achieved through the acid etching technique, while the most durable films were produced from development of sodium silicate films. Control of the acid etching technique is presently inadequate for production implementation. While films having excellent antireflective properties were fabricated by plasma etching techniques, all were water soluble.

  14. Reflective and antireflective coatings for the optical chain of the ASTRI SST-2M prototype

    NASA Astrophysics Data System (ADS)

    Bonnoli, Giacomo; Canestrari, Rodolfo; Catalano, Osvaldo; Pareschi, Giovanni; Perri, Luca; Stringhetti, Luca

    2013-09-01

    ASTRI is a Flagship Project of the Italian Ministry of Education, University and Research, led by the Italian National Institute of Astrophysics, INAF. One of the main aims of the ASTRI Project is the design, construction and on-field verification of a dual mirror (2M) end-to-end prototype for the Small Size Telescope (SST) envisaged to become part of the Cherenkov Telescope Array. The ASTRI SST-2M prototype is designed according to the Schwarzschild-Couder optical scheme, and adopts a camera based on Silicon Photo Multipliers (SiPM); it will be assembled at the INAF astronomical site of Serra La Nave on mount Etna (Catania, Italy) in the second half of 2014, and will start scientific validation phase soon after. With its 4m wide primary dish, the telescope will be sensitive to multi-TeV Very High Energy (VHE) gamma rays up to 100 TeV and above, with a point spread function of ~2 arcminutes and a wide (semiaperture 4.8°) corrected field of view. The peculiarities of the optical design and of the SiPM bandpass pushed towards specifically optimized choices in terms of reflective coatings for both the primary and the secondary mirror. Fully dielectric multi-layer coatings have been developed and tested as an option for the primary mirror, aiming to filter out the large Night Sky Background contamination at wavelengths λ>~700 nm. On the other hand, for the large monolithic secondary mirror a simpler design with quartz-overcoated aluminium has been optimized for incidences far from normality. The conformation of the ASTRI camera in turn pushed towards the design of a reimaging system based on thin pyramidal light guides, that could be optionally integrated in the focal surface, aiming to increase the fill factor. An anti-reflective coating optimized for a wide range of incident angles faraway from normality was specifically developed to enhance the UV-optical transparency of these elements. The issues, strategy, simulations and experimental results are thoroughly

  15. The effects of the bottom anti-reflective coating with different baked temperatures and thicknesses on nanoscale patterns

    NASA Astrophysics Data System (ADS)

    Zheng, Jie; Li, Ling; Chen, Weidong

    2015-12-01

    The bottom anti-reflective coating (BARC) material can enhance the resolution of the nanopatterns structures in laser interference lithography process. In this study, WIDE-B ARC material was investigated to confirm the reduction of the vertical standing wave which leads to defect of nanopatterns. And the critical dimension (CD) of 100 nm L/S patterns with and without the application of BARC material was fabricated by laser interference lithography technology. The compared results showed that BARC can effectively reduce CD swing and obtain more uniform nanopatterns. Meanwhile, we also verified the influence of cured temperature and film thickness of BARC on the uniformity of nanopatterns.

  16. A simplified method for generating periodic nanostructures by interference lithography without the use of an anti-reflection coating

    NASA Astrophysics Data System (ADS)

    Kapon, Omree; Muallem, Merav; Palatnik, Alex; Aviv, Hagit; Tischler, Yaakov. R.

    2015-11-01

    Interference lithography has proven to be a useful technique for generating periodic sub-diffraction limited nanostructures. Interference lithography can be implemented by exposing a photoresist polymer to laser light using a two-beam arrangement or more simply a one beam configuration based on a Lloyd's Mirror Interferometer. For typical photoresist layers, an anti-reflection coating must be deposited on the substrate to prevent adverse reflections from cancelling the holographic pattern of the interfering beams. For silicon substrates, such coatings are typically multilayered and complex in composition. By thinning the photoresist layer to a thickness well below the quarter wavelength of the exposing beam, we demonstrate that interference gratings can be generated without an anti-reflection coating on the substrate. We used ammonium dichromate doped polyvinyl alcohol as the positive photoresist because it provides excellent pinhole free layers down to thicknesses of 40 nm, and can be cross-linked by a low-cost single mode 457 nm laser, and can be etched in water. Gratings with a period of 320 nm and depth of 4 nm were realized, as well as a variety of morphologies depending on the photoresist thickness. This simplified interference lithography technique promises to be useful for generating periodic nanostructures with high fidelity and minimal substrate treatments.

  17. A simplified method for generating periodic nanostructures by interference lithography without the use of an anti-reflection coating

    SciTech Connect

    Kapon, Omree; Muallem, Merav; Palatnik, Alex; Aviv, Hagit; Tischler, Yaakov R.

    2015-11-16

    Interference lithography has proven to be a useful technique for generating periodic sub-diffraction limited nanostructures. Interference lithography can be implemented by exposing a photoresist polymer to laser light using a two-beam arrangement or more simply a one beam configuration based on a Lloyd's Mirror Interferometer. For typical photoresist layers, an anti-reflection coating must be deposited on the substrate to prevent adverse reflections from cancelling the holographic pattern of the interfering beams. For silicon substrates, such coatings are typically multilayered and complex in composition. By thinning the photoresist layer to a thickness well below the quarter wavelength of the exposing beam, we demonstrate that interference gratings can be generated without an anti-reflection coating on the substrate. We used ammonium dichromate doped polyvinyl alcohol as the positive photoresist because it provides excellent pinhole free layers down to thicknesses of 40 nm, and can be cross-linked by a low-cost single mode 457 nm laser, and can be etched in water. Gratings with a period of 320 nm and depth of 4 nm were realized, as well as a variety of morphologies depending on the photoresist thickness. This simplified interference lithography technique promises to be useful for generating periodic nanostructures with high fidelity and minimal substrate treatments.

  18. Evaluation of self-focusing influence on laser-induced damage threshold of anti-reflective coated windows

    NASA Astrophysics Data System (ADS)

    Rakickas, T.; Kudriašov, V.; Sirutkaitis, V.; Grigonis, R.; Gaižauskas, E.

    2005-12-01

    For high intensity lasers it is very important to choose appropriate optical elements. Since invention of high power lasers laser-induced damage of optical coatings was subject of extensive investigations. At high laser intensities the self-focusing in optical elements appears and intensity at rear optics surface can be much higher than at the front surface. Due to this damage of rear-surface can be reached much faster than damage of the front surface. We investigated the influence of self-focusing on damage threshold in fused-silica windows with anti-reflective coatings on both sides. In our experiments we used titanium-sapphire chirped pulse amplification system (130 fs, 2 mJ, 1 kHz repetition rate pulses at 800 nm). We have tested 1 mm, 3 mm and 6 mm thickness fused-silica windows with identical anti-reflective coatings. The front surface of the samples was placed in the waist of focused beam. The experiments were performed for effective spot diameters on the front 145 μm, 95 μm and 43 μm respectively. The experiments showed the self-focusing of beam inside the fused silica window and self-focusing dependence on initial beam diameter. The damage behavior was dependent on irradiation history. Also we found quite strong nonlinear absorption in fused silica.

  19. Wide band antireflective coatings Al2O3 / HfO2 / MgF2 for UV region

    NASA Astrophysics Data System (ADS)

    Winkowski, P.; Marszałek, Konstanty W.

    2013-07-01

    Deposition technology of the three layers antireflective coatings consists of hafnium compound are presented in this paper. Oxide films were deposited by means of e-gun evaporation in vacuum of 5x10-5 mbar in presence of oxygen and fluoride films by thermal evaporation. Substrate temperature was 250°C. Coatings were deposited onto optical lenses made from quartz glass (Corning HPFS). Thickness and deposition rate were controlled by thickness measuring system Inficon XTC/2. Simulations leading to optimization of thickness and experimental results of optical measurements carried during and after deposition process were presented. Physical thickness measurements were made during deposition process and were equal to 43 nm/74 nm/51 nm for Al2O3 / HfO2 / MgF2 respectively. Optimization was carried out for ultraviolet region from 230nm to the beginning of visible region 400 nm. In this region the average reflectance of the antireflective coating was less than 0.5% in the whole range of application.

  20. Novel low-reflective index fluoropolymers-based top anti-reflective coatings (TARC) for 193-nm lithography

    NASA Astrophysics Data System (ADS)

    Yamashita, Tsuneo; Hayami, Takashi; Ishikawa, Takuji; Kanemura, Takashi; Aoyama, Hirokazu

    2007-03-01

    Implant lithography, which has up to now utilized 365-nm (i-line) and 248-nm (KrF) light sources, must now turn to 193-nm (ArF) sources. In implant lithography, an anti-reflective material is often used to coat the resist-film. The top anti-reflective coating (abbreviated to TARC) is most often used to reduce CD swing. TARC materials must have low refractive index and water solubility. The TARC materials for used 193-nm use must have very low reflective index and alternatives to perfluorooctylsulfonic acid (PFOS) and perfluorooctanoic acid (PFOA) must be found. We synthesized some novel fluorinated amorphous polymers as 193-nm TARC candidates. Their fundamental properties were characterized, such as transparency and reflective index at 193-nm (wavelength) along with their solubility in water and a standard alkaline developer. High transparency, i.e., k value less than 0.01, and very low reflective index, i.e., lower than n=1.4 at 193-nm wavelength are confirmed. Their dissolution behaviors are studied using the Quartz Crystal Microbalance (QCM) method. In surprise finding, we find that several of the polymers examined, those that have high fluorine content, dissolved in water. Test results show that the proposed polymers can be applied as top anti reflective coatings .

  1. The Angular Performance Behavior Of Triple Junction Solar Cells With Different Antireflection Coatings For High Temperature Space Missions

    NASA Astrophysics Data System (ADS)

    Hulsheger, Tim; Brandt, Christian; Caon, Antonio; Fiebrich, Horst K.; Andreev, Thomas

    2011-10-01

    The angular behavior of GaInP2/GaAs/Ge triple junction solar cells is studied from 0° up to 86°. Angle dependent short circuit currents of cells with antireflection coatings such as TiO2/Al2O3 and Al2O3 are compared to results of uncoated cells. Performance benefits from each coating are measured before and after cover glass coverage. Related temperature effects are predicted taking into account measured absorption coefficients in order to address on the coating of choice for high temperature solar generators. The influence of the sun light intensities from 1 AM0 to 8 AM0 is put in relation with basic semiconductor properties.

  2. Antireflecting and polarizing dielectric single-layer coating at oblique incidence on absorbing substrates at λ = 10.6 μm.

    NASA Astrophysics Data System (ADS)

    Cojocaru, E.; Julea, T.

    Transparent single-layer antireflection coating on an absorbing substrate for p and s polarizations of the infrared light at λ = 10.6 μm as a function of the angle of incidence is studied in this paper. Two cases of low absorbing Ge, GaAs, ZnSe substrates and high absorbing Cu substrate are considered. It is found that the Cu substrate coated by an adequate antireflecting single-layer film functions as an excellent Rs = 0 reflection polarizer.

  3. Graphene oxide as a p-dopant and an anti-reflection coating layer, in graphene/silicon solar cells

    NASA Astrophysics Data System (ADS)

    Yavuz, S.; Kuru, C.; Choi, D.; Kargar, A.; Jin, S.; Bandaru, P. R.

    2016-03-01

    It is shown that coating graphene-silicon (Gr/Si) Schottky junction based solar cells with graphene oxide (GO) improves the power conversion efficiency (PCE) of the cells, while demonstrating unprecedented device stability. The PCE has been shown to be increased to 10.6% (at incident radiation of 100 mW cm-2) for the Gr/Si solar cell with an optimal GO coating thickness compared to 3.6% for a bare/uncoated Gr/Si solar cell. The p-doping of graphene by the GO, which also serves as an antireflection coating (ARC) has been shown to be a main contributing factor to the enhanced PCE. A simple spin coating process has been used to apply GO with thickness commensurate with an anti-refection coating (ARC) and indicates the suitability of the developed methodology for large-scale solar cell assembly.It is shown that coating graphene-silicon (Gr/Si) Schottky junction based solar cells with graphene oxide (GO) improves the power conversion efficiency (PCE) of the cells, while demonstrating unprecedented device stability. The PCE has been shown to be increased to 10.6% (at incident radiation of 100 mW cm-2) for the Gr/Si solar cell with an optimal GO coating thickness compared to 3.6% for a bare/uncoated Gr/Si solar cell. The p-doping of graphene by the GO, which also serves as an antireflection coating (ARC) has been shown to be a main contributing factor to the enhanced PCE. A simple spin coating process has been used to apply GO with thickness commensurate with an anti-refection coating (ARC) and indicates the suitability of the developed methodology for large-scale solar cell assembly. Electronic supplementary information (ESI) available: (i) Experimental methods, (ii) optical images of devices with and without graphene oxide (GO), (iii) comparison of the power conversion efficiency (PCE) due to the GO coating and nitric acid doping, (iv) specular and diffuse reflectance measurements, (v) stability data of pristine graphene/silicon (Gr/Si) solar cells. See DOI: 10.1039/c5

  4. Optimal design of antireflection coating and experimental verification by plasma enhanced chemical vapor deposition in small displays

    SciTech Connect

    Yang, S. M.; Hsieh, Y. C.; Jeng, C. A.

    2009-03-15

    Conventional antireflection coating by thin films of quarter-wavelength thickness is limited by material selections and these films' refractive indices. The optimal design by non-quarter-wavelength thickness is presented in this study. A multilayer thin-film model is developed by the admittance loci to show that the two-layer thin film of SiN{sub x}/SiO{sub y} at 124/87 nm and three layer of SiN{sub x}/SiN{sub y}/SiO{sub z} at 58/84/83 nm can achieve average transmittances of 94.4% and 94.9%, respectively, on polymer, glass, and silicon substrates. The optimal design is validated by plasma enhanced chemical vapor deposition of N{sub 2}O/SiH{sub 4} and NH{sub 3}/SiH{sub 4} to achieve the desired optical constants. Application of the antireflection coating to a 4 in. liquid crystal display demonstrates that the transmittance is over 94%, the mean luminance can be increased by 25%, and the total reflection angle increased from 41 deg. to 58 deg.

  5. Synthesis of antireflective silica coatings through the synergy of polypeptide layer-by-layer assemblies and biomineralization

    NASA Astrophysics Data System (ADS)

    Lee, Yung-Lun; Lin, Ting-Xuan; Hsu, Feng-Ming; Jan, Jeng-Shiung

    2016-01-01

    We report a versatile approach to synthesize silica coatings with antireflective (AR) characteristics through the combination of a layer-by-layer (LbL) assembly technique and biomineralization. LbL assembled decanoyl-modified poly(l-lysine)/poly(l-glutamic acid) (PLL-g-Dec/PLGA) multilayer films were used as templates for silica mineralization, followed by calcination. The specific deposition of silica onto the LbL polypeptide assemblies through amine-catalyzed polycondensation resulted in silica coatings that exhibited the transcription of the nano-/microstructured polypeptide films and their film thickness and porosity can be tuned by varying the number of bilayers, degree of substitution, and PLL molecular weight. AR silica coatings exhibiting more than 6% increase in transmittance in the near UV/visible spectral range can be obtained at an optimized refractive index, thickness, and surface roughness. The abrasion test showed that the silica coatings exhibited sufficient structural durability due to continuous silica nanostructures and low surface roughness. This study demonstrated that nanostructured thin films can be synthesized for AR coatings using the synergy between the LbL assembly technique and biomineralization.We report a versatile approach to synthesize silica coatings with antireflective (AR) characteristics through the combination of a layer-by-layer (LbL) assembly technique and biomineralization. LbL assembled decanoyl-modified poly(l-lysine)/poly(l-glutamic acid) (PLL-g-Dec/PLGA) multilayer films were used as templates for silica mineralization, followed by calcination. The specific deposition of silica onto the LbL polypeptide assemblies through amine-catalyzed polycondensation resulted in silica coatings that exhibited the transcription of the nano-/microstructured polypeptide films and their film thickness and porosity can be tuned by varying the number of bilayers, degree of substitution, and PLL molecular weight. AR silica coatings exhibiting

  6. Progress in the Growth of Yb:S-FAP Laser Crystals

    SciTech Connect

    Schaffers, K I; Tassano, J B; Waide, P A; Payne, S A; Morris, R C

    2000-07-01

    The crystal growth of Yb:S-FAP [Yb{sup 3+}:Sr{sub 5}(PO{sub 4}){sub 3}F] is being studied for 1.047-{micro}m laser operation. These crystals are not yet routinely available and the growth of high optical quality, low loss crystals poses a challenge due to a number of crystal growth issues, including, cloudiness, bubble core defects, anomalous absorption, low-angle grain boundaries, and cracking. At this time, a growth process has been formulated to simultaneously eliminate or greatly diminish each of the defects yielding high quality material. Laser slabs of dimension 4.0 x 6.0 x 0.75 cm are being fabricated from sub-scale pieces using the diffusion bonding technique.

  7. How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO2/SiO2 antireflection and high reflection coatings.

    DOE PAGESBeta

    Field, Ella Suzanne; Bellum, John Curtis; Kletecka, Damon E.

    2016-06-01

    Optical coatings with the highest laser damage thresholds rely on clean conditions in the vacuum chamber during the coating deposition process. A low base pressure in the coating chamber, as well as the ability of the vacuum system to maintain the required pressure during deposition, are important aspects of limiting the amount of defects in an optical coating that could induce laser damage. Our large optics coating chamber at Sandia National Laboratories normally relies on three cryo pumps to maintain low pressures for e-beam coating processes. However, on occasion, one or more of the cryo pumps have been out ofmore » commission. In light of this circumstance, we explored how deposition under compromised vacuum conditions resulting from the use of only one or two cryo pumps affects the laser-induced damage thresholds of optical coatings. Finally, the coatings of this study consist of HfO2 and SiO2 layer materials and include antireflection coatings for 527 nm at normal incidence, and high reflection coatings for 527 nm, 45⁰ angle of incidence (AOI), in P-polarization (P-pol).« less

  8. Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition.

    PubMed

    Liu, Zhichao; Chen, Songlin; Ma, Ping; Wei, Yaowei; Zheng, Yi; Pan, Feng; Liu, Hao; Tang, Gengyu

    2012-01-16

    Damage tests are carried out at 1064nm to measure the laser resistance of TiO(2)/Al(2)O(3) and HfO(2)/Al(2)O(3) antireflection coatings grown by atomic layer deposition (ALD). The damage results are determined by S-on-1 and R-on-1 tests. Interestingly, the damage performance of ALD coatings is similar to those grown by conventional e-beam evaporation process. A decline law of damage resistance under multiple irradiations is revealed. The influence of growth temperature on damage performance has been investigated. Result shows that the crystallization of TiO(2) layer at higher temperature could lead to numerous absorption defects that reduce the laser-induced damage threshold (LIDT). In addition, it has been found that using inorganic compound instead of organic compound as precursors for ALD process maybe effectively prevent carbon impurities in films and will increase the LIDT obviously. PMID:22274431

  9. Functional photocatalytically active and scratch resistant antireflective coating based on TiO2 and SiO2

    NASA Astrophysics Data System (ADS)

    Mazur, M.; Wojcieszak, D.; Kaczmarek, D.; Domaradzki, J.; Song, S.; Gibson, D.; Placido, F.; Mazur, P.; Kalisz, M.; Poniedzialek, A.

    2016-09-01

    Antireflection (AR) multilayer coating, based on combination of five TiO2 and SiO2 thin films, was deposited by microwave assisted reactive magnetron sputtering process on microscope glass substrates. In this work X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy and wettability measurements were used to characterize the structural and surface properties of the deposited coating. These studies revealed that prepared coating was amorphous with low surface roughness. Photocatalytic properties were determined based on phenol decomposition reaction. Measurements of optical properties showed that transmittance in the visible wavelength range was increased after the deposition of AR coating as-compared to bare glass substrate. The mechanical properties were determined on the basis of nano-indentation and scratch resistance tests. Performed research has shown that deposition of an additional thin 10 nm thick TiO2 thin film top layer, the prepared AR coating was photocatalytically active, hydrophobic, scratch resistant and had increased hardness as-compared to bare glass substrate. These results indicate that prepared AR multilayer could be used also as a self-cleaning and protective coating.

  10. Deep-ultraviolet tailored- and low-refractive index antireflection coatings for light-extraction enhancement of light emitting diodes

    NASA Astrophysics Data System (ADS)

    Yan, Xing; Shatalov, Max; Saxena, Tanuj; Shur, Michael S.

    2013-04-01

    An omnidirectional antireflection (AR) coating for a deep-ultraviolet (UV) AR band is designed and fabricated on the sapphire substrate of a deep-UV flip-chip light-emitting diode (LED) device. The two-layer AR coating uses the tailored- and low-refractive index nanoporous alumina fabricated by glancing-angle deposition methodology. The AR coating effectively matches the refractive indices between the air and sapphire substrate. At close-to-normal angles of incidence, this AR coating almost completely eliminates the Fresnel reflection at the sapphire/air interface of the deep-UV LED device. The resulting improvement of the light-extraction efficiency by 8% is in good agreement with the simulation results. For a total thickness of 172 nm for the two-layer AR coating, extinction was negligible (<2%). The results show that nanoporous alumina thin films are excellent tailored- and low-refractive index thin film materials for high-performance deep-UV AR coating applications.

  11. Antireflection coating formed by plasma-enhanced chemical-vapor deposition for terahertz-frequency germanium optics

    NASA Astrophysics Data System (ADS)

    Hosako, Iwao

    2003-07-01

    A method of manufacturing optical coatings for germanium optics used at terahertz frequencies has been developed. The various optical coatings used at terahertz frequencies are difficult to manufacture conventionally because these coatings must be as thick as several tens of micrometers, which is far thicker than those used in the optical region. One way to overcome this problem is to form a silicon oxide layer through plasma-enhanced chemical-vapor deposition, with silane (SiH4) as a source gas. Using this method, I formed 21-μm-thick silicon oxide films as antireflection (AR) layers for germanium optics and obtained low reflection at 1.7 THz (wavelength, λ = 175 μm). This method is easily applied to large-aperture optics and micro-optics as well as to optics with a complex surface form. The AR coatings can also be formed for photoconductive detectors made from germanium doped with gallium at a low temperature (160 °C) this low temperature ensures that the doped impurities in the germanium do not diffuse. Fabrication of optical coatings upon substrates that have refractive indices of 3.84-11.7 may also be possible by control of the refractive indices of the deposited layers.

  12. Synthesis of antireflective silica coatings through the synergy of polypeptide layer-by-layer assemblies and biomineralization.

    PubMed

    Lee, Yung-Lun; Lin, Ting-Xuan; Hsu, Feng-Ming; Jan, Jeng-Shiung

    2016-01-28

    We report a versatile approach to synthesize silica coatings with antireflective (AR) characteristics through the combination of a layer-by-layer (LbL) assembly technique and biomineralization. LbL assembled decanoyl-modified poly(l-lysine)/poly(l-glutamic acid) (PLL-g-Dec/PLGA) multilayer films were used as templates for silica mineralization, followed by calcination. The specific deposition of silica onto the LbL polypeptide assemblies through amine-catalyzed polycondensation resulted in silica coatings that exhibited the transcription of the nano-/microstructured polypeptide films and their film thickness and porosity can be tuned by varying the number of bilayers, degree of substitution, and PLL molecular weight. AR silica coatings exhibiting more than 6% increase in transmittance in the near UV/visible spectral range can be obtained at an optimized refractive index, thickness, and surface roughness. The abrasion test showed that the silica coatings exhibited sufficient structural durability due to continuous silica nanostructures and low surface roughness. This study demonstrated that nanostructured thin films can be synthesized for AR coatings using the synergy between the LbL assembly technique and biomineralization. PMID:26752150

  13. Antireflection and self-cleaning properties of a moth-eye-like surface coated with TiO2 particles.

    PubMed

    Nakata, Kazuya; Sakai, Munetoshi; Ochiai, Tsuyoshi; Murakami, Taketoshi; Takagi, Katsuhiko; Fujishima, Akira

    2011-04-01

    Poly(ethylene terephthalate) (PET) films with a moth-eye-like surface are coated with TiO(2) particles to form self-cleaning antireflective films. The use of a TiO(2) suspension of high concentration to coat the PET surface produces a thicker TiO(2) layer with smaller pores, whereas a low concentration of a TiO(2) suspension gives a thinner layer of TiO(2) with larger pores. The PET films coated with TiO(2) particles exhibit a high transmittance of 76-95% and almost no absorption in the range of 400-800 nm. The PET films coated with a TiO(2) suspension with a concentration of ≥2 vol % exhibit superhydrophilicity after irradiation with UV light. After irradiation, the superhydrophilic nature is retained for at least 18 days. The TiO(2)-coated PET films showed the ability to decompose methylene blue under UV irradiation. PMID:21391643

  14. Thin film gallium arsenide solar cell research. Third quarterly project report, September 1, 1980-November 30, 1980. [Antireflection coating

    SciTech Connect

    Chu, S. S.

    1980-12-01

    The major objective of this contract is to produce gallium arsenide solar cells of 10% conversion efficiency in films of less than 10 micrometers thick which have been deposited by chemical vapor deposition on graphite or tungsten coated graphite substrates. Major efforts during this quarter were directed to: (1) the optimization of the deposition of gallium arsenide films of 10 ..mu..m thickness or less on tungsten/graphic substrates, (2) the investigation of the effectiveness of various grain boundary passivation techniques, (3) the deposition of tantalum pentoxide by ion beam sputtering as an antireflection coating, (4) the deposition of gallium aluminium arsenide by the organometallic process, and (5) the fabrication and characterization of large area Schottky barrier type solar cells from gallium arsenide films of about 10 ..mu..m thickness. Various grain boundary passivation techniques, such as the anodic oxidation, thermal oxidation, and ruthenium treatment, have been investigated. The combination of thermal oxidation and ruthenium treatment has been used to fabricate Schottky barrier type solar cells. Large area MOS solar cells of 9 cm/sup 2/ area with AMl efficiency of 8.5% have been fabricated from ruthenium treated gallium arsenide films of 10 ..mu..m thickness. The construction of the apparatus for the deposition of gallium aluminum arsenide by the organometallic process has been completed. The deposition of good quality tantalum pentoxide film as an antireflection coating has been carried out by the ion beam sputtering technique. The short-circuit current density and AMl efficiency of the solar cells are increased by approximately 60%, with a slight increase in the open-circuit voltage. Details are presented. (WHK)

  15. 17.1%-Efficient Multi-Scale-Textured Black Silicon Solar Cells without Dielectric Antireflection Coating: Preprint

    SciTech Connect

    Toor, F.; Page, M. R.; Branz, H. M.; Yuan, H. C.

    2011-07-01

    In this work we present 17.1%-efficient p-type single crystal Si solar cells with a multi-scale-textured surface and no dielectric antireflection coating. Multi-scale texturing is achieved by a gold-nanoparticle-assisted nanoporous etch after conventional micron scale KOH-based pyramid texturing (pyramid black etching). By incorporating geometric enhancement of antireflection, this multi-scale texturing reduces the nanoporosity depth required to make silicon 'black' compared to nanoporous planar surfaces. As a result, it improves short-wavelength spectral response (blue response), previously one of the major limiting factors in 'black-Si' solar cells. With multi-scale texturing, the spectrum-weighted average reflectance from 350- to 1000-nm wavelength is below 2% with a 100-nm deep nanoporous layer. In comparison, roughly 250-nm deep nanopores are needed to achieve similar reflectance on planar surface. Here, we characterize surface morphology, reflectivity and solar cell performance of the multi-scale textured solar cells.

  16. ZnSe hollow nanospheres in mechanically stable near-IR antireflection coatings for ZnSe substrates.

    PubMed

    Li, Chao; Luo, Rui-Chun; Mao, Yong-Qiang; Du, Xi-Wen; Yang, Jing

    2016-09-01

    Though possessing low absorption throughout a wide infrared (IR) spectral regime, owing to a high refractive index, zinc selenide substrates are generally covered by antireflection coatings (ARCs) for practical optical uses. However, achieving a high transmission of ZnSe substrates in the near-IR (NIR) region is still challenging. Herein, for the first time, colloidal ZnSe hollow nanospheres (HNSs) smaller than 100 nm were prepared and adopted to assemble ARCs for ZnSe substrates. The voiding kinetics of the HNSs was found to agree well with the nanoscale Kirkendall effect, and the self-diffusion of the Zn ion in the core was faster than its diffusion through the ZnSe shell. With single-index ARCs, the transmission of ZnSe substrates was remarkably enhanced in the NIR region, with up to an 18% increase at 840 nm. Besides, the ZnSe HNS-based ARCs showed superior mechanical stability even under violent ultrasonication in organic solutions. We expect that ZnSe HNSs will make it possible to construct graded-index ARCs to realize omnidirectional and broadband antireflection in IR, through further tuning of HNSs' void fraction. PMID:27482737

  17. ZnSe hollow nanospheres in mechanically stable near-IR antireflection coatings for ZnSe substrates

    NASA Astrophysics Data System (ADS)

    Li, Chao; Luo, Rui-Chun; Mao, Yong-Qiang; Du, Xi-Wen; Yang, Jing

    2016-09-01

    Though possessing low absorption throughout a wide infrared (IR) spectral regime, owing to a high refractive index, zinc selenide substrates are generally covered by antireflection coatings (ARCs) for practical optical uses. However, achieving a high transmission of ZnSe substrates in the near-IR (NIR) region is still challenging. Herein, for the first time, colloidal ZnSe hollow nanospheres (HNSs) smaller than 100 nm were prepared and adopted to assemble ARCs for ZnSe substrates. The voiding kinetics of the HNSs was found to agree well with the nanoscale Kirkendall effect, and the self-diffusion of the Zn ion in the core was faster than its diffusion through the ZnSe shell. With single-index ARCs, the transmission of ZnSe substrates was remarkably enhanced in the NIR region, with up to an 18% increase at 840 nm. Besides, the ZnSe HNS-based ARCs showed superior mechanical stability even under violent ultrasonication in organic solutions. We expect that ZnSe HNSs will make it possible to construct graded-index ARCs to realize omnidirectional and broadband antireflection in IR, through further tuning of HNSs’ void fraction.

  18. Broadband omnidirectional antireflection coatings for metal-backed solar cells optimized using simulated annealing algorithm incorporated with solar spectrum.

    PubMed

    Chang, Yin-Jung; Chen, Yu-Ting

    2011-07-01

    Broadband omnidirectional antireflection (AR) coatings for solar cells optimized using simulated annealing (SA) algorithm incorporated with the solar (irradiance) spectrum at Earth's surface (AM1.57 radiation) are described. Material dispersions and reflections from the planar backside metal are considered in the rigorous electromagnetic calculations. Optimized AR coatings for bulk crystalline Si and thin-film CuIn(1-x)GaxSe(2) (CIGS) solar cells as two representative cases are presented and the effect of solar spectrum in the AR coating designs is investigated. In general, the angle-averaged reflectance of a solar-spectrum-incorporated AR design is shown to be smaller and more uniform in the spectral range with relatively stronger solar irradiance. By incorporating the transparent conductive and buffer layers as part of the AR coating in CIGS solar cells (2μm-thick CIGS layer), a single MgF(2) layer could provide an average reflectance of 8.46% for wavelengths ranging from 350 nm to 1200 nm and incident angles from 0° to 80°. PMID:21747557

  19. Dual wavelength laser-induced damage threshold measurements of alumina/silica and hafnia/silica ultraviolet antireflective coatings.

    PubMed

    Mrohs, Marius; Jensen, Lars; Günster, Stefan; Alig, Thimotheus; Ristau, Detlev

    2016-01-01

    An approach for the measurement of the laser-induced damage threshold with two wavelengths combined was made while testing antireflective coatings for the wavelengths 266 and 532 nm. Samples were made of Al2O3/SiO2 and HfO2/SiO2 ion beam sputtered films. The results show that adding radiation of a second wavelength might lead to a significant reduction of the threshold. The damage morphology of single and dual wavelength tests is very similar and does not suggest an altered damage mechanism. Further investigations indicated that the dual wavelength threshold is a function of the temporal delay of the two pulses. PMID:26835628

  20. Stability of anti-reflection coatings via the self-assembly encapsulation of silica nanoparticles by diazo-resins

    NASA Astrophysics Data System (ADS)

    Metzman, Jonathan S.; Ridley, Jason I.; Khalifa, Moataz B.; Heflin, James R.

    2015-12-01

    A modified silica nanoparticle (MSNP) solution was formed by the encapsulation of negatively charged silica nanoparticles by the UV-crosslinkable polycation oligomer diazo-resin (DAR). Appropriate DAR encapsulation concentrations were determined by use of zeta-potential and dynamic light scattering measurements. The MSNPs were used in conjunction with poly(styrene sulfonate) (PSS) to grow homogenous ionic self-assembled multilayer anti-reflection coatings. Stability was induced within the films by the exposure of UV-irradiation that allowed for crosslinking of the DAR and PSS. The films were characterized by UV/vis/IR spectroscopy and field emission scanning electron microscopy. The transmission and reflection levels were >98.5% and <0.05%, respectively. The refractive indices resided in the 1.25-1.26 range. The solvent stability was tested by sonication of the films in a ternary solvent (H2O/DMF/ZnCl2 3:5:2 w/w/w).

  1. Antireflection-coated blue GaN laser diodes in an external cavity and Doppler-free indium absorption spectroscopy.

    PubMed

    Hildebrandt, Lars; Knispel, Richard; Stry, Sandra; Sacher, Joachim R; Schael, Frank

    2003-04-20

    Commercially available GaN-based laser diodes were antireflection coated in our laboratory and operated in an external cavity in a Littrow configuration. A total tuning range of typically 4 nm and an optical output power of up to 30 mW were observed after optimization of the external cavity. The linewidth was measured with a beterodyne technique, and 0.8 MHz at a sweep time of 50 ms was obtained. The mode-hop-free tuning range was more than 50 GHz. We demonstrated the performance of the laser by detecting the saturated absorption spectrum of atomic indium at 410 nm, allowing observation of well-resolved Lamb dips. PMID:12716152

  2. Shallow-grating coupler with optimized anti-reflection coating for high-efficiency optical output into multimode fiber

    NASA Astrophysics Data System (ADS)

    Tokushima, Masatoshi; Ushida, Jun; Uemura, Toshinori; Kurata, Kazuhiko

    2015-09-01

    We present an optimized design of a shallow grating coupler in a silicon-on-insulator (SOI) wafer with a quadruple anti-reflection coating (ARC) of multiple layers of SiO2 and SiOxNy for coupling to a multimode fiber. The ARC is designed to generate sufficient destructive interference for downward emission while maintaining constructive interference for upward emission. We confirm numerically that the upward directionality of the grating is as high as -0.58 dB. Because the grating is shallow and the ARC is away from the SOI core layer, the back reflection along the input waveguide can be suppressed to -27 dB.

  3. An abrasion-resistant and broadband antireflective silica coating by block copolymer assisted sol-gel method.

    PubMed

    Zou, Liping; Li, Xiaoguang; Zhang, Qinghua; Shen, Jun

    2014-09-01

    A double-layer broadband antireflective (AR) coating was prepared on glass substrate via sol-gel process using two kinds of acid-catalyzed TEOS-derived silica sols. The relative dense layer with a porosity of ∼10% was obtained from an as-prepared sol, while the porous layer with a porosity of ∼55% was from a modified one with block copolymer (BCP) Pluronic F127 as template which results in abundant ordered mesopores. The two layers give rise to a reasonable refractive index gradient from air to the substrate and thus high transmittance in a wide wavelength range, and both of them have the same tough skeleton despite different porosity, for which each single-layer and the double-layer coatings all behaved well in the mechanical property tests. The high transmittance and the strong ability of resisting abrasion make this coating promising for applications in some harsh conditions. In addition, the preparation is simple, low-cost, time-saving, and flexible for realizing the optical property. PMID:25117300

  4. Anti-reflection coatings on large area glass sheets. Final report, Motorola report No. 2366/4, DRD No. SE-5

    SciTech Connect

    Pastirik, E.

    1980-09-01

    Antireflective coatings which may be suitable for use on the covers of photovoltaic solar modules can be easily produced by a dipping process. The coatings are applied to glass by drawing sheets of glass vertically out of dilute aqueous sodium silicate solutions at a constant speed, allowing the adherent liquid film to dry, then exposing the dried film to concentrated sulfuric acid, followed by a water rinse and dry. The process produces coatings of good optical performance (96.7% peak transmission at 0.540 ..mu..M wavelength) combined with excellent stain and soil resistance, and good resistance to abrasion. The process is reproduceable and easily controlled.

  5. TiO2/Ni composite as antireflection coating for solar cell application

    NASA Astrophysics Data System (ADS)

    Haider, Adawiya J.; Najim, Aus A.; Muhi, Malik A. H.

    2016-07-01

    Titanium dioxide (TiO2) considered as one of the best material already used as a window in solar cells due to its antireflection capability. In this work, pure and Ni-doped (1, 3 and 5 wt%) TiO2 thin films were deposited using pulsed laser deposition (PLD) method. The optical measurements obtained by UV-vis indicate that the highest optical band gap was found with (5%) doping level (Eg=3.82 eV), corresponding to a lower reflectance and higher transmittance. Empirical equations between energy band gap and concentration level, reflectance with energy band gap, refractive index and concentration have been determined; a perfect fit with the experimental data was obtained.

  6. Films Consisting of Innumerable Tapered Nanopillars of Mesoporous Silica for Universal Antireflection Coatings.

    PubMed

    Miyata, Hirokatsu; Kitamura, Shin; Watanabe, Masatoshi; Takahashi, Masahiko

    2016-05-20

    Films with a fine structure consisting of innumerable nanopillars of mesoporous silica (MPS) are formed by a reactive ion etching process with a fluorine-containing gas. Each nanopillar has a tapered shape with a uniform height, which effectively suppresses reflection by the formation of an ideal graded refractive index structure. The nanopillars are spontaneously formed under low-pressure conditions, wherein locally deposited Al-F compounds, originating from an alumina plate in the etching chamber, work as a fine etching mask. The high etching rate of the MPS film allows a very high aspect ratio of the nanopillars. The refractive index of the MPS nanopillars can be universally tuned by a controlled incorporation of TiO2 into the mesopores, which results in effective reduction of reflectance on a given substrate. The outstanding antireflection performance is experimentally demonstrated for glass substrates with a wide refractive index range. PMID:27017295

  7. High efficiency antireflection coating in MWIR region (3.6-4.9 μm) simultaneously effective for Germanium and Silicon optics

    NASA Astrophysics Data System (ADS)

    Bhatt, Meenakshi; Nautiyal, B. B.; Bandyopadhyay, P. K.

    2010-01-01

    Antireflection coatings have critical importance in thermal imaging system working in MWIR region (3-5 μm) since optics of high refractive index materials are used. Germanium (Ge) and Silicon (Si) optics are used extensively in the MWIR thermal systems. In this paper a study has been carried out on the design and fabrication of multi-substrate antireflection coating effective for Germanium and Silicon optics in MWIR (3.6-4.9 μm) region. The wave band 3.6-4.9 μm is chosen for the reported work because detector system used in MWIR region has a band selection filter effective in the same wavelength region and atmospheric transmission window in MWIR region is effective in 3-5 μm spectral band. Comprehensive search method was used to design the multilayer stack on the substrate. The coating materials used in the design were Germanium (Ge), Hafnium oxide (HfO 2) and Y-Ba-Fluoride (IR-F625). The fabrication of coating was made in a coating plant fitted with Cryo pump system and residual gas analyzer (RGA). The evaporation was carried out at high vacuum (2-6 × 10 -6 mbar) with the help of electron beam gun system and layer thicknesses were measured with crystal monitor. The result achieved for the antireflection coating was 98.5% average transmission in 3.6-4.9 μm band for Germanium and Silicon optics. This work will be helpful in reducing the plant operation time, material and power consumption, as two different kinds of optics are simultaneously coated in a single coating cycle.

  8. Antireflection Coating Design for Series Interconnected Multi-Junction Solar Cells

    SciTech Connect

    AIKEN,DANIEL J.

    1999-11-29

    AR coating design for multi-junction solar cells can be more challenging than in the single junction case. Reasons for this are discussed. Analytical expressions used to optimize AR coatings for single junction solar cells are extended for use in monolithic, series interconnected multi-junction solar cell AR coating design. The result is an analytical expression which relates the solar cell performance (through J{sub SC}) directly to the AR coating design through the device reflectance. It is also illustrated how AR coating design can be used to provide an additional degree of freedom for current matching multi-junction devices.

  9. Enhancement of the Performance of GaAs based Solar Cells by using Plasmonic, Anti-Reflection Coating and Hydrophobic Effects

    NASA Astrophysics Data System (ADS)

    Makableh, Yahia F.

    Investigation of renewable energy resources is gaining huge momentum in recent years due to the limited fossil fuels, and their detriment impact on the environment. Solar energy is promising to meet the increased energy demand. In order to achieve this goal, solar energy has to be harvested efficiently at low cost. Therefore, higher efficiency solar cells are the primary focus of research worldwide. Photovoltaics based on InAs/GaAs intermediate band solar cells and their device performance enhancements are investigated in this dissertation. The device enhancement is carried out by surface modification methods. The dissertation work is inspired by the need of improved efficiency solar cells to meet the new energy demands. In this project, InAs/GaAs intermediate band solar cell and their device performance enhancement are investigated. The device enhancement is carried out though implementing surface modification by using plasmonic effect, anti-reflection coatings and self-cleaning surfaces. Single junction and quantum dots solar cells performance has been unsatisfying due to several optical losses especially high surface reflection. Hence, in this project, potential application of plasmonic effect and significant device performance enhancement implementing anti-reflection coating are studied experimentally. Significantly, GaAs based photovoltaics solar cells efficiencies were improved by 40 - 50 %. In addition, self-cleaning surfaces with contact angle above 156° has been achieved. This self-cleaning surface can ensure proper functionality of the anti-reflection coatings.

  10. Design and fabrication of multi-layers infrared antireflection coating consisting of ZnS and Ge on ZnS substrate

    NASA Astrophysics Data System (ADS)

    Zarei Moghadam, R.; Ahmadvand, H.; Jannesari, M.

    2016-03-01

    We have designed, fabricated and characterized a multi-layers antireflection coating on multispectral ZnS substrate, suitable for the infrared range of 8-12 μm. The 4-layers coating (Ge/ZnS/Ge/ZnS) with optimized thicknesses was fabricated by PVD technique and studied by FTIR, nanoindentation and AFM. From FTIR spectroscopy it was found that, in the wavelength range of 8-12 μm, the average transmittance of the double-side coated sample increases by about 26% and its maximum reaches about 98%. To improve the mechanical hardness, a bilayer of Y2O3/carbon was deposited on the coating. Nanoindentation test shows that the coating enhances the mechanical properties. The final coating have successfully passed durability and environmental tests.

  11. Sol-gel preparation of hydrophobic silica antireflective coatings with low refractive index by base/acid two-step catalysis.

    PubMed

    Cai, Shuang; Zhang, Yulu; Zhang, Hongli; Yan, Hongwei; Lv, Haibing; Jiang, Bo

    2014-07-23

    Hydrophobic antireflective coatings with a low refractive index were prepared via a base/acid-catalyzed two-step sol-gel process using tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) as precursors, respectively. The base-catalyzed hydrolysis of TEOS leads to the formation of a sol with spherical silica particles in the first step. In the second step, the acid-catalyzed MTES hydrolysis and condensation occur at the surface of the initial base-catalyzed spherical silica particles, which enlarge the silica particle size from 12.9 to 35.0 nm. By a dip-coating process, this hybrid sol gives an antireflective coating with a refractive index of about 1.15. Moreover, the water contact angles of the resulted coatings increase from 22.4 to 108.7° with the increases of MTES content, which affords the coatings an excellent hydrophobicity. A "core-shell" particle growth mechanism of the hybrid sol was proposed and the relationship between the microstructure of silica sols and the properties of AR coatings was investigated. PMID:24979297

  12. Rapid replication and facile modulation of subwavelength antireflective polymer film using injection nanomolding and optical property of multilayer coatings

    PubMed Central

    2013-01-01

    A rapid, cost-effective and high-throughput process for nanotexturing subwavelength structures with high uniformity using the polycarbonate (PC) is realized via injection nanomolding. The process enables the precise control of nanohole array (NHA) surface topography (nanohole depth, diameter, and periodicity) over large areas thereby presenting a highly versatile platform for fabricating substrates with user-defined, functional performance. Specifically, the optical property of the PC substrates were systematically characterized and tuned through the modulation of the depths of NHA. The aspect ratio submicron holes can be easily modulated and experimentally proven by simply adjusting the molding temperature. The nanotextured depths were reliably fabricated in the range of 200 to 400 nm with a period of approximately 700 nm. The fabricated PC films can reduce the reflectivity from an original bare film of 10.2% and 8.9% to 1.4% and 2.1% with 400-nm depth of nanoholes at the wavelength of 400 and 550 nm, respectively. Compared with conventional moth-like nanostructures with nanopillar arrays with heights adjustable only by an etching process, this paper proposes a facile route with submicron holes to achieve a similar antireflective function, with a significantly reduced time and facile height modulation capability. Furthermore, the effects of multilayer coatings of dielectric and metallic layers on the nanomolded NHA have been performed and potential sensing application is explored. PMID:24088185

  13. Rapid replication and facile modulation of subwavelength antireflective polymer film using injection nanomolding and optical property of multilayer coatings.

    PubMed

    Fuh, Yiin-Kuen; Peng, Cheng-Chang; Huang, Chieh-Tse

    2013-01-01

    A rapid, cost-effective and high-throughput process for nanotexturing subwavelength structures with high uniformity using the polycarbonate (PC) is realized via injection nanomolding. The process enables the precise control of nanohole array (NHA) surface topography (nanohole depth, diameter, and periodicity) over large areas thereby presenting a highly versatile platform for fabricating substrates with user-defined, functional performance. Specifically, the optical property of the PC substrates were systematically characterized and tuned through the modulation of the depths of NHA. The aspect ratio submicron holes can be easily modulated and experimentally proven by simply adjusting the molding temperature. The nanotextured depths were reliably fabricated in the range of 200 to 400 nm with a period of approximately 700 nm. The fabricated PC films can reduce the reflectivity from an original bare film of 10.2% and 8.9% to 1.4% and 2.1% with 400-nm depth of nanoholes at the wavelength of 400 and 550 nm, respectively. Compared with conventional moth-like nanostructures with nanopillar arrays with heights adjustable only by an etching process, this paper proposes a facile route with submicron holes to achieve a similar antireflective function, with a significantly reduced time and facile height modulation capability. Furthermore, the effects of multilayer coatings of dielectric and metallic layers on the nanomolded NHA have been performed and potential sensing application is explored. PMID:24088185

  14. Rapid replication and facile modulation of subwavelength antireflective polymer film using injection nanomolding and optical property of multilayer coatings

    NASA Astrophysics Data System (ADS)

    Fuh, Yiin-Kuen; Peng, Cheng-Chang; Huang, Chieh-Tse

    2013-10-01

    A rapid, cost-effective and high-throughput process for nanotexturing subwavelength structures with high uniformity using the polycarbonate (PC) is realized via injection nanomolding. The process enables the precise control of nanohole array (NHA) surface topography (nanohole depth, diameter, and periodicity) over large areas thereby presenting a highly versatile platform for fabricating substrates with user-defined, functional performance. Specifically, the optical property of the PC substrates were systematically characterized and tuned through the modulation of the depths of NHA. The aspect ratio submicron holes can be easily modulated and experimentally proven by simply adjusting the molding temperature. The nanotextured depths were reliably fabricated in the range of 200 to 400 nm with a period of approximately 700 nm. The fabricated PC films can reduce the reflectivity from an original bare film of 10.2% and 8.9% to 1.4% and 2.1% with 400-nm depth of nanoholes at the wavelength of 400 and 550 nm, respectively. Compared with conventional moth-like nanostructures with nanopillar arrays with heights adjustable only by an etching process, this paper proposes a facile route with submicron holes to achieve a similar antireflective function, with a significantly reduced time and facile height modulation capability. Furthermore, the effects of multilayer coatings of dielectric and metallic layers on the nanomolded NHA have been performed and potential sensing application is explored.

  15. High-Quality Hollow Closed-Pore Silica Antireflection Coatings Based on Styrene-Acrylate Emulsion @ Organic-Inorganic Silica Precursor.

    PubMed

    Guo, Zhaolong; Zhao, Haixin; Zhao, Wei; Wang, Tao; Kong, Depeng; Chen, Taojing; Zhang, Xiaoyan

    2016-05-11

    Making use of a facile and low-cost way for the preparation of a hierarchically organized novel hollow closed-pore silica antireflective coating (CHAR) with tailored optical properties and a mechanical reliability is of great interest in the field of solar photovoltaic technology. The process mainly contains two aspects: (1) a styrene-acrylate emulsion @ organic-inorganic silica precursor (SA@OISP) core/shell hierarchical nanostructure, consisting of a sacrificial styrene-acrylate (SA) primary template, was fabricated using a sol-gel method; (2) the self-assembly of the nanostructures leads to SA@OISP nanospheres forming the high-quality hollow closed-pore silica antireflection coating (CHAR) by a dip-coating process and a subsequent calcination treatment. The resulting SA@OISP nanospheres have a mean diameter of 65.2 nm and contained a SA soft core with a mean diameter of approximately 54.8 nm and an organic-inorganic silica precursor (OISP) shell with a thickness of approximately 6-10 nm. Furthermore, the prepared CHAR film exhibited a high transmittance and good ruggedness. An average transmittance (TAV) of 97.64% was obtained, and the value is close to the ideal single-layered antireflection coating (98.09%) over a broad range of wavelengths (from 380 to 1100 nm). The CHAR film showed a stable TAV, with attenuation values of less than 0.8% and 0.43% after the abrasion test and the damp heat test, respectively. The conversion efficiency of the CHAR coating cover solar modules tends to be increased by 3.75%. The promising results obtained in this study suggest that the CHAR film was considered as an essential component of the solar module and were expected to provide additional solar energy harvest under extreme outdoor climates. PMID:27104837

  16. Broad Band Antireflection Coating on Zinc Sulphide Window for Shortwave infrared cum Night Vision System

    NASA Astrophysics Data System (ADS)

    Upadhyaya, A. S.; Bandyopadhyay, P. K.

    2012-11-01

    In state of art technology, integrated devices are widely used or their potential advantages. Common system reduces weight as well as total space covered by its various parts. In the state of art surveillance system integrated SWIR and night vision system used for more accurate identification of object. In this system a common optical window is used, which passes the radiation of both the regions, further both the spectral regions are separated in two channels. ZnS is a good choice for a common window, as it transmit both the region of interest, night vision (650 - 850 nm) as well as SWIR (0.9 - 1.7 μm). In this work a broad band anti reflection coating is developed on ZnS window to enhance the transmission. This seven layer coating is designed using flip flop design method. After getting the final design, some minor refinement is done, using simplex method. SiO2 and TiO2 coating material combination is used for this work. The coating is fabricated by physical vapour deposition process and the materials were evaporated by electron beam gun. Average transmission of both side coated substrate from 660 to 1700 nm is 95%. This coating also acts as contrast enhancement filter for night vision devices, as it reflect the region of 590 - 660 nm. Several trials have been conducted to check the coating repeatability, and it is observed that transmission variation in different trials is not very much and it is under the tolerance limit. The coating also passes environmental test for stability.

  17. Thermography and k-means clustering methods for anti-reflective coating film inspection: scratch and bubble defects

    NASA Astrophysics Data System (ADS)

    Zhou, Xunfei; Wang, Hongjin; Hsieh, Sheng-Jen (Tony)

    2016-05-01

    Anti-reflective coating is widely used on telescopes, eyeglasses and screens to effectively enhance the transmission of light. However, the presence of defects such as bubbles or scratches lowers the usability and functionality of optical film. Optical cameras are often used for coating inspection, but their accuracy relies heavily on the illumination source, camera viewing angles and defect location. This paper describes an active thermography approach that can potentially overcome this issue. Eighteen scratch and bubble defects were located on AR film with dimensions ranging from 0.03mm to 4.4 mm. An infrared camera was used to capture thermal images of those defects over 65 seconds of heating. After the thermal images were acquired, time-domain analysis and space-domain analysis were conducted and k-means clustering methodology was used to highlight the defective area. Results suggest active thermography can be used to detect scratch defects with widths of 0.03mm to 4.40 mm and bubble defects with diameters ranging from 0.08 to 4 mm. For defects with dimensions larger than 0.4 mm, our algorithm can estimate the dimension with less than 15% bias. However, for defects with dimensions less than 0.4mm, the algorithm estimation error ranged from 68% to 900% due to camera resolution limitations. It should be noted that our algorithm can still distinguish a scratch defect with a width of less than one pixel. This study also suggests active thermography can detect scratch and bubble defects regardless of the location of the illumination source.

  18. Perfect anti-reflection from first principles

    NASA Astrophysics Data System (ADS)

    Kim, Kyoung-Ho; Q-Han Park

    2013-01-01

    Reducing unwanted reflections through impedance matching, called anti-reflection, has long been an important challenge in optics and electrical engineering. Beyond trial and error optimization, however, a systematic way to realize anti-reflection is still absent. Here, we report the discovery of an analytic solution to this long standing problem. For electromagnetic waves, we find the graded permittivity and permeability that completely remove any given impedance mismatch. We demonstrate that perfect broadband anti-reflection is possible when a dispersive, graded refractive index medium is used for the impedance-matching layer. We also present a design rule for the ultra-thin anti-reflection coating which we confirm experimentally by showing the anti-reflection behavior of an exemplary λ/25-thick coating made of metamaterials. This work opens a new path to anti-reflection applications in optoelectronic device, transmission line and stealth technologies.

  19. Antireflection coating on germanium for dual channel (3-5 and 7.5-10.6 μm) thermal imagers

    NASA Astrophysics Data System (ADS)

    Ghosh, A.; Kant, P.; Bandyopadhyay, P. K.; Chandra, P.; Nijhawan, O. P.

    1999-02-01

    The dual channel thermal imager, operating in the 3-5 and 7.5-10.6 μm wavelength bands, is one of the latest achievements in instrumentation for target recognition and acquisition. While the 3-5 μm band is utilised for detecting hot objects such as engine exhausts of vehicles and fighter planes, the 7.5-10.6 μm band is employed for human bodies and objects at ambient temperatures. Many substrates are available which transmit in both these wavelength bands and their transmission can be enhanced by providing a suitable antireflection coating. In this paper, a broad band antireflection coating on germanium substrate is reported. The design approach involves achieving a continuously varying refractive index from that of the incident medium to the substrate. The continuously varying refractive index profile may be generated by using a sequence of thin layers of high and low refractive index materials. In this design a continuous refractive index profile is approximated by using a 13-layer stack of thorium fluoride and germanium as low and high index coating materials respectively. This coating conforms to environmental stability standards and shows an average transmission of 91% in 3-5 μm band and 94.5% in 7.5-10.6 μm band with a peak of 97% at 9 μm on 10 mm thick germanium substrate. Polycrystalline germanium has 2.5% absorption for a 10 mm thick substrate.

  20. Ultraporous nanocrystalline TiO2-based films: synthesis, patterning and application as anti-reflective, self-cleaning, superhydrophilic coatings

    NASA Astrophysics Data System (ADS)

    Faustini, Marco; Grenier, Antonin; Naudin, Guillaume; Li, Ronghua; Grosso, David

    2015-11-01

    Crack-free, anatase-based optical coatings with a refractive index down to 1.27, a porosity up to 80 vol%, and a tunable thickness up to 1.5 μm were fabricated. The extraordinary stability of the porosity upon thermally induced crystallisation and template removal was attributed to the combined effects of the presence of 10% molar silica in the inorganic phase, a flash treatment at 500 °C, and the use of templates with different dimensions ranging from a few nanometers to 50 nm. The hierarchical porous system was directly patterned by UV lithography and used as multifunctional anti-reflective, self-cleaning coatings.Crack-free, anatase-based optical coatings with a refractive index down to 1.27, a porosity up to 80 vol%, and a tunable thickness up to 1.5 μm were fabricated. The extraordinary stability of the porosity upon thermally induced crystallisation and template removal was attributed to the combined effects of the presence of 10% molar silica in the inorganic phase, a flash treatment at 500 °C, and the use of templates with different dimensions ranging from a few nanometers to 50 nm. The hierarchical porous system was directly patterned by UV lithography and used as multifunctional anti-reflective, self-cleaning coatings. Electronic supplementary information (ESI) available. See DOI: 10.1039/c5nr06466j

  1. An Evaluation of Atmospheric-pressure Plasma for the Cost-Effective Deposition of Antireflection Coatings

    SciTech Connect

    Rob Sailer; Guruvenket Srinivasan; Kyle W. Johnson; Douglas L. Schulz

    2010-04-01

    Atmospheric-pressure plasma deposition (APPD) has previously been used to deposit various functional materials including polymeric surface modification layers, transparent conducting oxides, and photo catalytic materials. For many plasma polymerized coatings, reaction occurs via free radical mechanism where the high energy electrons from the plasma activate the olefinic carbon-carbon double bonds - a typical functional group in such precursors. The precursors for such systems are typically inexpensive and readily available and have been used in vacuum PECVD previously. The objectives are to investigate: (1) the effect of plasma power, gas composition and substrate temperature on the Si-based film properties using triethylsilane(TES) as the precursor; and (2) the chemical, mechanical, and optical properties of several experimental matrices based on Design of Experiment (DOE) principals. A simple APPD route has been utilized to deposit Si based films from an inexpensive precursor - Triethylsilane (TES). Preliminary results indicates formation of Si-C & Si-O and Si-O, Si-C & Si-N bonds with oxygen and nitrogen plasmas respectively. N{sub 2}-O{sub 2} plasma showed mixed trend; however oxygen remains a significant portion of all films, despite attempts to minimize exposure to atmosphere. SiN, SiC, and SiO ratios can be modified by the reaction conditions resulting in differing film properties. SE studies revealed that films with SiN bond possess refractive index higher than coatings with Si-O/Si-C bonds. Variable angle reflectance studies showed that SiOCN coatings offer AR properties; however thickness and refractive index optimization of these coatings remains necessary for application as potential AR coatings.

  2. Preparation and stress evolution of sol-gel SiO2 antireflective coatings for small-size anisotropic lithium triborate crystals

    NASA Astrophysics Data System (ADS)

    Tian, Bingtao; Wang, Xiaodong; Niu, Yanyan; Zhang, Jinlong; Zhang, Qinghua; Zhang, Zhihua; Wu, Guangming; Zhou, Bin; Shen, Jun

    2016-04-01

    Lithium triborate (LiB3O5, LBO) crystal is now one of the most useful nonlinear optical materials for frequency conversion of high power lasers. The use of the crystal, however, has been hampered by the unavailability of antireflective (AR) coatings with high laser damage resistance. In this work, a "point contact" dip-coating method is developed to prepare sol-gel SiO2 AR coatings on small-size LBO crystals. Using this approach, we obtain a homogenous coating surface on an 8 mm×8 mm×3 mm LBO crystal. The stress measurements show that the stresses in sol-gel SiO2 coatings vary with the time of natural drying, which is beyond our expectation. The anisotropic Young's modulus of the LBO crystal and the different evolution tendency of the stress in the different SiO2 coating layers are found to be responsible for the crack of the double-layer AR coatings on anisotropic LBO crystal. Meanwhile, the resulting coatings on LBO crystal achieve a LIDT of over 15 J/cm2 (532 nm, 3ns) and the coated LBO is expected to have a transmittance of over 99% at 800 nm.

  3. Radiation sensitive developable bottom anti-reflective coatings (DBARC) for 193nm lithography: first generation

    NASA Astrophysics Data System (ADS)

    Toukhy, Medhat; Oberlander, Joseph; Mullen, Salem; Lu, PingHung; Neisser, Mark

    2007-03-01

    A first generation DBARC applicable for 1 st minimum 193nm lithography is described in this paper. The polymer used in this DBARC is insoluble in the casting solvent of the resist, which is propyleneglycolmonomethyletheracetate (PGMEA). Photo acid generator (PAG) and base extractions from the DBARC coating by the resist casting solvent were examined by the DBARC dissolution rates in the developer, before and after solvent treatments. Although the resist and the DBARC do not appear to intermix, strong interaction between the two is evident by their lithographic performance and dissolution rate study.

  4. Optimal design and fabrication method for antireflection coatings for P-polarized 193 nm laser beam at large angles of incidence (68°-74°).

    PubMed

    Jin, Jingcheng; Jin, Chunshui; Li, Chun; Deng, Wenyuan; Chang, Yanhe

    2013-09-01

    Most of the optical axes in modern systems are bent for optomechanical considerations. Antireflection (AR) coatings for polarized light at oblique incidence are widely used in optical surfaces like prisms or multiform lenses to suppress undesirable reflections. The optimal design and fabrication method for AR coatings with large-angle range (68°-74°) for a P-polarized 193 nm laser beam is discussed in detail. Experimental results showed that after coating, the reflection loss of a P-polarized laser beam at large angles of incidence on the optical surfaces is reduced dramatically, which could greatly improve the output efficiency of the optical components in the deep ultraviolet vacuum range. PMID:24323257

  5. Composite films prepared by plasma ion-assisted deposition (IAD) for design and fabrication of antireflection coatings in visible and near-infrared spectral regions

    NASA Astrophysics Data System (ADS)

    Tsai, Rung-Ywan; Ho, Fang C.

    1994-11-01

    Ion-assisted deposition (IAD) processes configured with a well-controlled plasma source at the center base of a vacuum chamber, which accommodates two independent e-gun sources, is used to deposition TiO2MgF2 and TiO2-SiO2 composite films of selected component ratios. Films prepared by this technology are found durable, uniform, and nonabsorbing in visible and near-IR regions. Single- and multilayer antireflection coatings with refractive index from 1.38 to 2.36 at (lambda) equals 550 nm are presented. Methods of enhancement in optical performance of these coatings are studied. The advantages of AR coatings formed by TiO2-MgF2 composite films over those similar systems consisting of TiO2-SiO2 composite films in both visible and near-IR regions are also presented.

  6. Impact of different cleaning processes on the laser damage threshold of antireflection coatings for Z-Backlighter optics at Sandia National Laboratories

    NASA Astrophysics Data System (ADS)

    Field, Ella; Bellum, John; Kletecka, Damon

    2014-12-01

    We have examined how three different cleaning processes affect the laser-induced damage threshold (LIDT) of antireflection coatings for large dimension, Z-Backlighter laser optics at Sandia National Laboratories. Laser damage thresholds were measured after the coatings were created, and again 4 months later to determine which cleaning processes were most effective. Coatings that received cleaning exhibited the highest LIDTs compared to coatings that were not cleaned. In some cases, there is nearly a twofold increase in the LIDT between the cleaned and uncleaned coatings (19.4 J/cm2 compared to 39.1 J/cm2). Higher LIDTs were realized after 4 months of aging. The most effective cleaning process involved washing the coated surface with mild detergent, and then soaking the optic in a mixture of ethyl alcohol and deionized water. Also, the laser damage results indicate that the presence of nonpropagating (NP) damage sites dominates the LIDTs of almost every optic, despite the cleaning process used. NP damage sites can be attributed to defects such as nodules in the coating or surface contamination, which suggests that pursuing further improvements to the deposition or cleaning processes are worthwhile to achieve even higher LIDTs.

  7. Optical and mechanical behavior of GeC and BP antireflection coatings under rain erosion tests

    NASA Astrophysics Data System (ADS)

    Mackowski, Jean-Marie; Cimma, B.; Lacuve, J.; Laprat, Patrice

    1994-09-01

    Thick germanium carbide (GeC) and boron phosphide (BP) films are successfully grown on various zinc sulfide and germanium substrates at temperatures up to 450 degree(s)C by reactive radio-frequency sputtering (RRFS). The sputtering conditions are respectively a germanium target within a medium of methane-argon for GeC films and a high density boron target in a sputtering medium of phosphine-argon for BP films. The rain erosion resistance of GeC and BP films protected or not by diamond-like carbon (DLC) coating on top are measured for water drop diameter of 1.2 mm or 2 mm with an impact velocity ranging from 210 m/s to 265 m/s on the Saab-Scania whirling-arm rig facilities (Linkoping, Sweden). Rain erosion resistance of BP films for a wavelength band in the 8 micrometers to 10 micrometers range shows no damage for a speed up to 250 m/s with an exposure time up to 10 min, whereas the GeC rain erosion resistance shows no damage up to 235 m/s for the same exposure time. The transmission of each film is well correlated to its optical absorption at 10.6 micrometers . The GeC absorption can be reduced down to 40 cm-1 whereas the BP absorption stays around 220 cm-1 for sputtered films. So the compromise between the optical performance and the rain erosion resistance can be achieved by the use of GeC or BP films.

  8. Effects of the chemical bonding on the optical and mechanical properties for germanium carbide films used as antireflection and protection coating of ZnS windows

    NASA Astrophysics Data System (ADS)

    Hu, Chaoquan; Zheng, Weitao; Tian, Hongwei; LeXu; Jiang, Qing

    2006-05-01

    Germanium carbide (Ge1-xCx) films have been prepared by RF reactive sputtering a pure Ge(111) target at different flow rate ratios of CH4/(CH4+Ar) in a CH4/Ar mixture discharge, and it has been found that the composition, chemical bonding, optical and mechanical properties of Ge1-xCx films are remarkably influenced by the flow rate ratio of CH4/(CH4+Ar). The effects of the chemical bonding on the optical and mechanical properties of the Ge1-xCx films have been explored. In addition, an antireflection Ge1-xCx double-layer coating deposited on both sides of the ZnS substrate wafer has been developed for application as an infrared window. It is shown that the transmittance in the wavelength region between 8 and 12 µm and the hardness of the ZnS substrate have been significantly improved by the double-layer coating.

  9. Efficiency enhancement of non-selenized Cu(In,Ga)Se2 solar cells employing scalable low-cost antireflective coating

    PubMed Central

    2014-01-01

    In this study, a non-selenized CuInGaSe2 (CIGS) solar device with textured zinc oxide (ZnO) antireflection coatings was studied. The ZnO nanostructure was fabricated by a low-temperature aqueous solution deposition method. With controlling the morphology of the solution-grown tapered ZnO nanorod coatings, the average reflectance of the CIGS solar device decreased from 8.6% to 2.1%, and the energy conversion efficiency increased from 9.1% to 11.1%. The performance improvement in the CuInGaSe2 thin-film solar cell was well explained due to the gradual increase of the refractive index between air and the top electrode of solar cell device by the insertion of the ZnO nanostructure. The results demonstrate a potential application of the ZnO nanostructure array for efficient solar device technology. PMID:25114632

  10. Ultraporous nanocrystalline TiO2-based films: synthesis, patterning and application as anti-reflective, self-cleaning, superhydrophilic coatings.

    PubMed

    Faustini, Marco; Grenier, Antonin; Naudin, Guillaume; Li, Ronghua; Grosso, David

    2015-12-14

    Crack-free, anatase-based optical coatings with a refractive index down to 1.27, a porosity up to 80 vol%, and a tunable thickness up to 1.5 μm were fabricated. The extraordinary stability of the porosity upon thermally induced crystallisation and template removal was attributed to the combined effects of the presence of 10% molar silica in the inorganic phase, a flash treatment at 500 °C, and the use of templates with different dimensions ranging from a few nanometers to 50 nm. The hierarchical porous system was directly patterned by UV lithography and used as multifunctional anti-reflective, self-cleaning coatings. PMID:26549535

  11. Performance enhancement of plasmonics silicon solar cells using Al2O3/In NPs/TiO2 antireflective surface coating

    NASA Astrophysics Data System (ADS)

    Ho, Wen-Jeng; Lee, Yi-Yu; Lin, Chi-He; Yeh, Chien-Wu

    2015-11-01

    In this study, the enhancement of silicon solar cell photovoltaic performance by means of indium nanoparticles (In NPs) deposited on the TiO2 space layer and capped with an Al2O3 antireflective layer is demonstrated. The impressive performance enhancement is attributed to the plasmonic scattering of broadband light which occurs as a result of the Al2O3/In NPs/TiO2 antireflective coating (PARC) surface structure. The optical reflectance, photovoltaic current-voltage (I-V), external quantum efficiency (EQE), and photovoltaic performance as a function of the incident angles are measured and compared. The experimental results show that the reflectance decreases with increasing TiO2 thickness and that the lowest reflection point of the spectrum was red-shifted by the use of a PARC surface structure. EQE was significantly enhanced between 400 and 1050 nm wavelengths and much high EQE of 85% were observed for the cell with In NPs embedded in the 65-nm Al2O3/20 nm TiO2 layer structure. In comparison to a bare reference solar cell, an efficiency enhancement of 54.47% (from 10.96% to 16.93%) and a short-circuit current density enhancement of 52.83% (from 26.10 to 39.89 mA/cm2) were obtained for the cell with a 65-nm Al2O3/In NPs/20-nm TiO2 antireflection structure under normal incident illumination. In addition, for incident angles from 0° to 15°, the 0.78% decrease in conversion efficiency (from 16.71% to 16.58%) of the cell with the PARC surface structure was less than the 3.28% (from 13.86% to 13.49%) decrease of the cell with 65-nm Al2O3/20-nm TiO2 double layer antireflective coating (DL-ARC) due to the plasmonic scattering of broadband light.

  12. The impact of different cleaning processes on the laser damage threshold of antireflection coatings for Z-Backlighter optics at Sandia National Laboratories

    NASA Astrophysics Data System (ADS)

    Field, Ella; Bellum, John; Kletecka, Damon

    2014-09-01

    The Z-Backlighter lasers at Sandia National Laboratories are kilojoule class, pulsed systems operating with ns pulse lengths at 527 nm and ns and sub-ps pulse lengths at 1054 nm (www.z-beamlet.sandia.gov), and are linked to the most powerful and energetic x-ray source in the world, the Z-Accelerator (http://www.sandia.gov/z-machine/). An important Z-Backlighter optic is a flat, fused silica optic measuring 32.5 cm × 32.5 cm × 1 cm with an antireflection (AR) coating on both sides. It is used as a debris shield to protect other Z-Backlighter laser optics from high-velocity particles released by the experiments conducted in the Z-Accelerator. Each experiment conducted in the Z-Accelerator releases enough debris to cloud the surface of a debris shield, which means that a debris shield cannot be used for more than one experiment. Every year, the large optics coating facility [1] at Sandia provides AR coatings for approximately 50 debris shields, in addition to AR coatings for numerous other meter-class Z-Backlighter lenses and windows. As with all Z-Backlighter optical coatings, these AR coatings must have a high laser-induced damage threshold (LIDT) in order to withstand the powerful Z-Backlighter laser fluences. Achieving a good LIDT depends not only on the coating deposition processes but also on the polishing and cleaning processes used to prepare the coated and uncoated surfaces [2]. We spend a lot of time, both before and after the coatings have been deposited, manually cleaning the optics, including the debris shields, even though they are an expendable type of optic. Therefore, in this study we have tested new cleaning methods in addition to our current method to determine their impact on the LIDT of AR coatings, and conclude whether a shorter-duration or less labor-intensive cleaning process would suffice.

  13. How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO2/SiO2 antireflection and high-reflection coatings

    NASA Astrophysics Data System (ADS)

    Field, Ella S.; Bellum, John C.; Kletecka, Damon E.

    2015-11-01

    Optical coatings with the highest laser damage thresholds rely on clean conditions in the vacuum chamber during the coating deposition process. A low base pressure in the coating chamber, as well as the ability of the vacuum system to maintain the required pressure during deposition, are important aspects of limiting the amount of defects in an optical coating that could induce laser damage. Our large optics coating chamber at Sandia National Laboratories normally relies on three cryo pumps to maintain low pressures for e-beam coating processes. However, on occasion, one or more of the cryo pumps have been out of commission. In light of this circumstance, we decided to explore how deposition under compromised vacuum conditions resulting from the use of only one or two cryo pumps affects the laser-induced damage thresholds of optical coatings. The coatings of this study consist of HfO2 and SiO2 layer materials and include antireflection coatings for 527 nm at normal incidence, and high reflection coatings for 527 nm, 45° angle of incidence (AOI), in P-polarization (P-pol).

  14. Antireflection Coatings 1: BASICS

    SciTech Connect

    Martin, Peter M.

    2005-11-15

    Reflections off windows, eyeglass lenses, computer and television screens, and optical components can be very annoying and sometimes dangerous. Reflection of light incident on an optical window or optical component can degrade the performance of the window and the optical system associated with the window over its operating spectral range, whether it is the human eye or an optical device. Thin films can help us with this problem.

  15. Omnidirectional wavelength selective emitters/absorbers based on dielectric-filled anti-reflection coated two-dimensional metallic photonic crystals

    NASA Astrophysics Data System (ADS)

    Yeng, Yi Xiang; Chou, Jeffrey B.; Rinnerbauer, Veronika; Shen, Yichen; Kim, Sang-Gook; Joannopoulos, John D.; Soljačić, Marin; Čelanović, Ivan

    2014-08-01

    We demonstrate designs of dielectric-filled anti-reflection coated (ARC) two-dimensional (2D) metallic photonic crystals (MPhCs) capable of omnidirectional, polarization insensitive, wavelength selective emission/absorption. Up to 26% improvement in hemispherically averaged emittance/absorptance below the cutoff wavelength is observed for optimized hafnium oxide filled 2D tantalum (Ta) PhCs over the unfilled 2D Ta PhCs. The optimized designs possess high hemispherically averaged emittance/absorptance of 0.86 at wavelengths below the cutoff wavelength and low hemispherically averaged emittance/absorptance of 0.12 at wavelengths above the cutoff wavelength, which is extremely promising for applications such as thermophotovoltaic energy conversion, solar absorption, and infrared spectroscopy.

  16. The Mercury Laser System: An Average power, gas-cooled, Yb:S-FAP based system with frequency conversion and wavefront correction

    SciTech Connect

    Bibeau, C; Bayramian, A; Armstrong, P; Ault, E; Beach, R; Benapfl, M; Campbell, R; Dawson, J; Ebbers, C; Freitas, B; Kent, R; Liao, Z; Ladran, T; Menapace, J; Molander, B; Moses, E; Oberhelman, S; Payne, S; Peterson, N; Schaffers, K; Stolz, C; Sutton, S; Tassano, J; Telford, S; Utterback, E; Randles, M

    2005-08-31

    We report on the operation of the Mercury laser with fourteen 4 x 6 cm{sup 2} Yb:S-FAP amplifier slabs pumped by eight 100 kW peak power diode arrays. The system was continuously run at 55 J and 10 Hz for several hours, (2 x 10{sup 5} cumulative shots) with over 80% of the energy in a 6 times diffraction limited spot at 1.047 um. Improved optical quality was achieved in Yb:S-FAP amplifiers with magneto-rheological finishing, a deterministic polishing method. In addition, average power frequency conversion employing YCOB was demonstrated at 50% conversion efficiency or 22.6 J at 10 Hz.

  17. Effects of the chemical bonding on the optical and mechanical properties for germanium carbide films used as antireflection and protection coating of ZnS windows.

    PubMed

    Hu, Chaoquan; Zheng, Weitao; Tian, Hongwei; Xu, Le; Jiang, Qing

    2006-05-01

    Germanium carbide (Ge(1-x)C(x)) films have been prepared by RF reactive sputtering a pure Ge(111) target at different flow rate ratios of CH(4)/(CH(4)+Ar) in a CH(4)/Ar mixture discharge, and it has been found that the composition, chemical bonding, optical and mechanical properties of Ge(1-x)C(x) films are remarkably influenced by the flow rate ratio of CH(4)/(CH(4)+Ar). The effects of the chemical bonding on the optical and mechanical properties of the Ge(1-x)C(x) films have been explored. In addition, an antireflection Ge(1-x)C(x) double-layer coating deposited on both sides of the ZnS substrate wafer has been developed for application as an infrared window. It is shown that the transmittance in the wavelength region between 8 and 12 µm and the hardness of the ZnS substrate have been significantly improved by the double-layer coating. PMID:21690777

  18. Design of a Three-Layer Antireflection Coating for High Efficiency Indium Phosphide Solar Cells Using a Chemical Oxide as First Layer

    NASA Technical Reports Server (NTRS)

    Moulot, Jacques; Faur, Mircea; Faur, Maria; Goradia, Chandra; Goradia, Manju; Bailey, Sheila

    1995-01-01

    It is well known that the behavior of III-V compound based solar cells is largely controlled by their surface, since the majority of light generated carriers (63% for GaAs and 79% for InP) are created within 0.2 microns of the illuminated surface of the cell. Consequently, the always observed high surface recombination velocity (SRV) on these cells is a serious limiting factor for their high efficiency performance, especially for those with the p-n junction made by either thermal diffusion or ion implantation. A good surface passivation layer, ideally, a grown oxide as opposed to a deposited one, will cause a significant reduction in the SRV without adding interface problems, thus improving the performance of III-V compound based solar cells. Another significant benefit to the overall performance of the solar cells can be achieved by a substantial reduction of their large surface optical reflection by the use of a well designed antireflection (AR) coating. In this paper, we demonstrate the effectiveness of using a chemically grown, thermally and chemically stable oxide, not only for surface passivation but also as an integral part of a 3- layer AR coating for thermally diffused p(+)n InP solar cells. A phosphorus-rich interfacial oxide, In(PO3)3, is grown at the surface of the p(+) emitter using an etchant based on HNO3, o-H3PO4 and H2O2. This oxide has the unique properties of passivating the surface as well as serving as a fairly efficient antireflective layer yielding a measured record high AM0, 25 C, open-circuit voltage of 890.3 mV on a thermally diffused InP(Cd,S) solar cell. Unlike conventional single layer AR coatings such as ZnS, Sb2O3, SiO or double layer AR coatings such as ZnS/MgF2 deposited by e-beam or resistive evaporation, this oxide preserves the stoichiometry of the InP surface. We show that it is possible to design a three-layer AR coating for a thermally diffused InP solar cell using the In(PO3)3 grown oxide as the first layer and Al2O3, MgF2 or

  19. Design of a three-layer antireflection coating for high efficiency indium phosphide solar cells using a chemical oxide as first layer

    NASA Technical Reports Server (NTRS)

    Moulot, Jacques; Faur, M.; Faur, M.; Goradia, C.; Goradia, M.; Bailey, S.

    1995-01-01

    It is well known that the behavior of III-V compound based solar cells is largely controlled by their surface, since the majority of light generated carriers (63% for GaAs and 79% for InP) are created within 0.2 mu m of the surface of the illuminated cell. Consequently, the always observed high surface recombination velocity (SRV) on these cells is a serious limiting factor for their high efficiency performance, especially for those with p-n junction made by either thermal diffusion or ion implantation. A good surface passivation layer, ideally a grown oxide as opposed to a deposited one, will cause a significant reduction in the SRV without adding interface problems, thus improving the performance of III-V compound based solar cells. Another significant benefit to the overall performance of the solar cells can be achieved by a substantial reduction of their large surface optical reflection by the use of a well designed antireflection (AR) coating. In this paper, we demonstrate the effectiveness of using a chemically grown thermally and chemically stable oxide, not only for surface passivation but also as an integral part of a 3-layer AR coating for thermally diffused p+n InP solar cells. A phosphorus-rich interfacial oxide, In(PO3)3, is grown at the surface of the p+ emitter using an etchant based on HNO3, o-H3PO4 and H2O2. This oxide has the unique properties of passivating the surface as well as serving as an efficient antireflective layer yielding a measured record high AMO open-circuit voltage of 890.3 mV on a thermally diffused InP(Cd,S) solar cell. Unlike conventional single layer AR coatings such as ZnS, Sb2O3, SiO or double layer AR coatings such as ZnS/MgF2 deposited by e-beam or resistive evaporation, this oxide preserves the stoichiometry of the InP surface. We show that it is possible to design a three-layer AR coating for a thermally diffused InP solar cell using the In(PO3)3 grown oxide as the first layer and Al2O3 and MgF2 as the second and third

  20. A novel method for crystalline silicon solar cells with low contact resistance and antireflection coating by an oxidized Mg layer

    PubMed Central

    2012-01-01

    One of the key issues in the solar industry is lowering dopant concentration of emitter for high-efficiency crystalline solar cells. However, it is well known that a low surface concentration of dopants results in poor contact formation between the front Ag electrode and the n-layer of Si. In this paper, an evaporated Mg layer is used to reduce series resistance of c-Si solar cells. A layer of Mg metal is deposited on a lightly doped n-type Si emitter by evaporation. Ag electrode is screen printed to collect the generated electrons. Small work function difference between Mg and n-type silicon reduces the contact resistance. During a co-firing process, Mg is oxidized, and the oxidized layer serves as an antireflection layer. The measurement of an Ag/Mg/n-Si solar cell shows that Voc, Jsc, FF, and efficiency are 602 mV, 36.9 mA/cm2, 80.1%, and 17.75%, respectively. It can be applied to the manufacturing of low-cost, simple, and high-efficiency solar cells. PMID:22221405

  1. ECR CVD of silicon oxynitride films for antireflection coating of 10 Gbit/s, 1.56 {micro}m multi-quantum well InP/InGaAsP Mach-Zehnder modulators

    SciTech Connect

    Rousina-Webb, R.; Dzioba, S.; Gallant, M.; Raine, L.; Tong, R.; Rolland, C.

    1996-12-31

    This paper describes the development of electron cyclotron resonance (ECR) plasma-deposited SiO{sub x}N{sub y} single layer anti-reflecting (AR) optical coatings for III-V 10 Gbit/s, 1.56 {micro}m Mach-Zehnder (MZ) modulators. In this paper the authors report of the fabrication and characterization of SiO{sub x}N{sub y} films deposited by ECR CVD which provides low ion energy ({approximately} < 25 eV) bombardment, low plasma damage and low deposition temperature to produce high quality, stable AR facet coatings.

  2. Improvement in light harvesting of dye-sensitized solar cells with antireflective and hydrophobic textile PDMS coating by facile soft imprint lithography.

    PubMed

    Lim, Joo Ho; Ko, Yeong Hwan; Leem, Jung Woo; Yu, Jae Su

    2015-02-01

    We demonstrated the improved conversion efficiency (η) of dye-sensitized solar cells (DSSCs) using the textile-patterned polydimethylsiloxane (PDMS) antireflection layers prepared by metal-coated textile master molds by a simple soft imprint lithography. When light propagates through the textile-patterned surface of PDMS (i.e., textile PDMS) laminated on the outer glass surface deposited with fluorine-doped tin oxide (i.e., FTO/glass), both the transmitted and diffused lights into the photo-anode of DSSCs were simultaneously enhanced. Compared to the bare FTO/glass, the textile PDMS increased the total transmittance from 82.3 to 85.1% and its diffuse transmittance was significantly increased from 5.9 to 78.1% at 550 nm of wavelength. The optical property of textile PDMS was also theoretically analyzed by the finite-difference time-domain simulation. By laminating the textile PDMS onto the outer glass surface of DSSCs, the η was enhanced from 6.04 to 6.51%. Additionally, the fabricated textile PDMS exhibited a hydrophobic surface with water contact angle of ~123.15°. PMID:25836246

  3. Measurements and simulations of the optical gain and anti-reflection coating modal reflectivity in quantum cascade lasers with multiple active region stacks

    SciTech Connect

    Bidaux, Y.; Terazzi, R.; Bismuto, A.; Gresch, T.; Blaser, S.; Muller, A.; Faist, J.

    2015-09-07

    We report spectrally resolved gain measurements and simulations for quantum cascade lasers (QCLs) composed of multiple heterogeneous stacks designed for broadband emission in the mid-infrared. The measurement method is first demonstrated on a reference single active region QCL based on a double-phonon resonance design emitting at 7.8 μm. It is then extended to a three-stack active region based on bound-to-continuum designs with a broadband emission range from 7.5 to 10.5 μm. A tight agreement is found with simulations based on a density matrix model. The latter implements exhaustive microscopic scattering and dephasing sources with virtually no fitting parameters. The quantitative agreement is furthermore assessed by measuring gain coefficients obtained by studying the threshold current dependence with the cavity length. These results are particularly relevant to understand fundamental gain mechanisms in complex semiconductor heterostructure QCLs and to move towards efficient gain engineering. Finally, the method is extended to the measurement of the modal reflectivity of an anti-reflection coating deposited on the front facet of the broadband QCL.

  4. Defect Band Luminescence Intensity Reversal as Related to Application of Anti-Reflection Coating on mc-Si PV Cells: Preprint

    SciTech Connect

    Guthrey, H.; Johnston, S.; Yan, F.; Gorman, B.; Al-Jassim, M.

    2012-06-01

    Photoluminescence (PL) imaging is widely used to identify defective regions within mc-Si PV cells. Recent PL imaging investigations of defect band luminescence (DBL) in mc-Si have revealed a perplexing phenomenon. Namely, the reversal of the DBL intensity in various regions of mc-Si PV material upon the application of a SiNx:H anti-reflective coating (ARC). Regions with low DBL intensity before ARC application often exhibit high DBL intensity afterwards, and the converse is also true. PL imaging alone cannot explain this effect. We have used high resolution cathodoluminescence (CL) spectroscopy and electron beam induced current (EBIC) techniques to elucidate the origin of the DBL intensity reversal. Multiple sub-bandgap energy levels were identified that change in peak position and intensity upon the application of the ARC. Using this data, in addition to EBIC contrast information, we provide an explanation for the DBL intensity reversal based on the interaction of the detected energy levels with the SiNx:H ARC application. Multiple investigations have suggested that this is a global problem for mc-Si PV cells. Our results have the potential to provide mc-Si PV producers a pathway to increased efficiencies through defect mitigation strategies.

  5. Measurements and simulations of the optical gain and anti-reflection coating modal reflectivity in quantum cascade lasers with multiple active region stacks

    NASA Astrophysics Data System (ADS)

    Bidaux, Y.; Terazzi, R.; Bismuto, A.; Gresch, T.; Blaser, S.; Muller, A.; Faist, J.

    2015-09-01

    We report spectrally resolved gain measurements and simulations for quantum cascade lasers (QCLs) composed of multiple heterogeneous stacks designed for broadband emission in the mid-infrared. The measurement method is first demonstrated on a reference single active region QCL based on a double-phonon resonance design emitting at 7.8 μm. It is then extended to a three-stack active region based on bound-to-continuum designs with a broadband emission range from 7.5 to 10.5 μm. A tight agreement is found with simulations based on a density matrix model. The latter implements exhaustive microscopic scattering and dephasing sources with virtually no fitting parameters. The quantitative agreement is furthermore assessed by measuring gain coefficients obtained by studying the threshold current dependence with the cavity length. These results are particularly relevant to understand fundamental gain mechanisms in complex semiconductor heterostructure QCLs and to move towards efficient gain engineering. Finally, the method is extended to the measurement of the modal reflectivity of an anti-reflection coating deposited on the front facet of the broadband QCL.

  6. Silicon nitride anti-reflection coating on the glass and transparent conductive oxide interface for thin film solar cells and modules

    NASA Astrophysics Data System (ADS)

    Iwahashi, T.; Morishima, M.; Fujibayashi, T.; Yang, R.; Lin, J.; Matsunaga, D.

    2015-10-01

    Anti-reflection coating (ARC) is well known as an important technique to enhance solar cell performance. Typical ARC has been applied on the glass surface to reduce light reflection loss at the air/glass interface. However, reflection loss occurs not only at glass surface but also at other interfaces such as glass/transparent conductive oxide (TCO) interface. The refractive index of SiNx is tunable from 1.6 to 2.7, and the range from 1.7 to 2.0 is suitable for ARC at glass/TCO interface. In this study, we examined the AR effect of silicon nitride (SiNx) deposited by plasma enhanced chemical vapor deposition at the glass/TCO interface with thin film silicon solar cell and module. Reflectivity reduction of 1.6% for glass/ZnO substrate has been obtained with optimal SiNx layer, which contribute 2.0% gain in cell efficiency. Besides, we also confirmed the relative efficiency gain of around 2% for large-sized solar module, leading to a world-record large area stabilized module conversion efficiency of 12.34%.

  7. Fabrication and characterization of silicon wire solar cells having ZnO nanorod antireflection coating on Al-doped ZnO seed layer

    PubMed Central

    2012-01-01

    In this study, we have fabricated and characterized the silicon [Si] wire solar cells with conformal ZnO nanorod antireflection coating [ARC] grown on a Al-doped ZnO [AZO] seed layer. Vertically aligned Si wire arrays were fabricated by electrochemical etching and, the p-n junction was prepared by spin-on dopant diffusion method. Hydrothermal growth of the ZnO nanorods was followed by AZO film deposition on high aspect ratio Si microwire arrays by atomic layer deposition [ALD]. The introduction of an ALD-deposited AZO film on Si wire arrays not only helps to create the ZnO nanorod arrays, but also has a strong impact on the reduction of surface recombination. The reflectance spectra show that ZnO nanorods were used as an efficient ARC to enhance light absorption by multiple scattering. Also, from the current-voltage results, we found that the combination of the AZO film and ZnO nanorods on Si wire solar cells leads to an increased power conversion efficiency by more than 27% compared to the cells without it. PMID:22222067

  8. Optical properties of the Al2O3/SiO2 and Al2O3/HfO2/SiO2 antireflective coatings

    NASA Astrophysics Data System (ADS)

    Marszałek, Konstanty; Winkowski, Paweł; Jaglarz, Janusz

    2014-01-01

    Investigations of bilayer and trilayer Al2O3/SiO2 and Al2O3/HfO2/SiO2 antireflective coatings are presented in this paper. The oxide films were deposited on a heated quartz glass by e-gun evaporation in a vacuum of 5 × 10-3 [Pa] in the presence of oxygen. Depositions were performed at three different temperatures of the substrates: 100 °C, 200 °C and 300 °C. The coatings were deposited onto optical quartz glass (Corning HPFS). The thickness and deposition rate were controlled with Inficon XTC/2 thickness measuring system. Deposition rate was equal to 0.6 nm/s for Al2O3, 0.6 nm - 0.8 nm/s for HfO2 and 0.6 nm/s for SiO2. Simulations leading to optimization of the thin film thickness and the experimental results of optical measurements, which were carried out during and after the deposition process, have been presented. The optical thickness values, obtained from the measurements performed during the deposition process were as follows: 78 nm/78 nm for Al2O3/SiO2 and 78 nm/156 nm/78 nm for Al2O3/HfO2/SiO2. The results were then checked by ellipsometric technique. Reflectance of the films depended on the substrate temperature during the deposition process. Starting from 240 nm to the beginning of visible region, the average reflectance of the trilayer system was below 1 % and for the bilayer, minima of the reflectance were equal to 1.6 %, 1.15 % and 0.8 % for deposition temperatures of 100 °C, 200 °C and 300 °C, respectively.

  9. New three-layer antireflection/surface passivating coating for high efficiency III-V compound solar cells

    SciTech Connect

    Moulot, J.; Faur, M.; Goradia, C.; Goradia, M.; Faur, M.; Alterovitz, S.; Bailey, S.

    1996-12-31

    By using a chemically grown In(PO{sub 3}){sub 3}-rich oxide layer as the first layer of a 3-layer AR coating, with Al{sub 2}O{sub 3} and MgF{sub 2} as the second and third layers, the authors have addressed the problem of surface passivation and AR coating on InP solar cells. They have designed a 3-layer optimized AR coating for p{sup +}n InP solar cell, which reduces the average reflectance on the surface of cell from about 40% (bare) to less than 2%. At the same time the AR coating significantly improves the J{sub SC} and V{sub OC} by passivating the top surface of the emitter. The authors believe that the significant front surface passivation is to a large extent responsible for their achieving the record high AM0, 25 C, open-circuit voltage of 890.3 mV on a thermally diffused p{sup +}n InP(Cd,S) solar cell. This concept of using a passivating chemically grown oxide as the first layer of a multilayer AR coating can be beneficial to other III-V compound solar cells as well.

  10. Multi-layer coatings

    DOEpatents

    Maghsoodi, Sina; Brophy, Brenor L.; Abrams, Ze'ev R.; Gonsalves, Peter R.

    2016-06-28

    Disclosed herein are coating materials and methods for applying a top-layer coating that is durable, abrasion resistant, highly transparent, hydrophobic, low-friction, moisture-sealing, anti-soiling, and self-cleaning to an existing conventional high temperature anti-reflective coating. The top coat imparts superior durability performance and new properties to the under-laying conventional high temperature anti-reflective coating without reducing the anti-reflectiveness of the coating. Methods and data for optimizing the relative thickness of the under-layer high temperature anti-reflective coating and the top-layer thickness for optimizing optical performance are also disclosed.