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Sample records for bipolar junction transistor

  1. Ion bipolar junction transistors.

    PubMed

    Tybrandt, Klas; Larsson, Karin C; Richter-Dahlfors, Agneta; Berggren, Magnus

    2010-06-01

    Dynamic control of chemical microenvironments is essential for continued development in numerous fields of life sciences. Such control could be achieved with active chemical circuits for delivery of ions and biomolecules. As the basis for such circuitry, we report a solid-state ion bipolar junction transistor (IBJT) based on conducting polymers and thin films of anion- and cation-selective membranes. The IBJT is the ionic analogue to the conventional semiconductor BJT and is manufactured using standard microfabrication techniques. Transistor characteristics along with a model describing the principle of operation, in which an anionic base current amplifies a cationic collector current, are presented. By employing the IBJT as a bioelectronic circuit element for delivery of the neurotransmitter acetylcholine, its efficacy in modulating neuronal cell signaling is demonstrated. PMID:20479274

  2. Ion bipolar junction transistors

    PubMed Central

    Tybrandt, Klas; Larsson, Karin C.; Richter-Dahlfors, Agneta; Berggren, Magnus

    2010-01-01

    Dynamic control of chemical microenvironments is essential for continued development in numerous fields of life sciences. Such control could be achieved with active chemical circuits for delivery of ions and biomolecules. As the basis for such circuitry, we report a solid-state ion bipolar junction transistor (IBJT) based on conducting polymers and thin films of anion- and cation-selective membranes. The IBJT is the ionic analogue to the conventional semiconductor BJT and is manufactured using standard microfabrication techniques. Transistor characteristics along with a model describing the principle of operation, in which an anionic base current amplifies a cationic collector current, are presented. By employing the IBJT as a bioelectronic circuit element for delivery of the neurotransmitter acetylcholine, its efficacy in modulating neuronal cell signaling is demonstrated. PMID:20479274

  3. Magnetoamplification in a Bipolar Magnetic Junction Transistor

    NASA Astrophysics Data System (ADS)

    Rangaraju, N.; Peters, J. A.; Wessels, B. W.

    2010-09-01

    We have demonstrated the first bipolar magnetic junction transistor using a dilute magnetic semiconductor. For an InMnAs p-n-p transistor magnetoamplification is observed at room temperature. The observed magnetoamplification is attributed to the magnetoresistance of the magnetic semiconductor InMnAs heterojunction. The magnetic field dependence of the transistor characteristics confirm that the magnetoamplification results from the junction magnetoresistance. To describe the experimentally observed transistor characteristics, we propose a modified Ebers-Moll model that includes a series magnetoresistance attributed to spin-selective conduction. The capability of magnetic field control of the amplification in an all-semiconductor transistor at room temperature potentially enables the creation of new computer logic architecture where the spin of the carriers is utilized.

  4. Polyphosphonium-based ion bipolar junction transistors

    PubMed Central

    Gabrielsson, Erik O.; Berggren, Magnus

    2014-01-01

    Advancements in the field of electronics during the past few decades have inspired the use of transistors in a diversity of research fields, including biology and medicine. However, signals in living organisms are not only carried by electrons but also through fluxes of ions and biomolecules. Thus, in order to implement the transistor functionality to control biological signals, devices that can modulate currents of ions and biomolecules, i.e., ionic transistors and diodes, are needed. One successful approach for modulation of ionic currents is to use oppositely charged ion-selective membranes to form so called ion bipolar junction transistors (IBJTs). Unfortunately, overall IBJT device performance has been hindered due to the typical low mobility of ions, large geometries of the ion bipolar junction materials, and the possibility of electric field enhanced (EFE) water dissociation in the junction. Here, we introduce a novel polyphosphonium-based anion-selective material into npn-type IBJTs. The new material does not show EFE water dissociation and therefore allows for a reduction of junction length down to 2 μm, which significantly improves the switching performance of the ion transistor to 2 s. The presented improvement in speed as well the simplified design will be useful for future development of advanced iontronic circuits employing IBJTs, for example, addressable drug-delivery devices. PMID:25553192

  5. Free electron gas primary thermometer: The bipolar junction transistor

    SciTech Connect

    Mimila-Arroyo, J.

    2013-11-04

    The temperature of a bipolar transistor is extracted probing its carrier energy distribution through its collector current, obtained under appropriate polarization conditions, following a rigorous mathematical method. The obtained temperature is independent of the transistor physical properties as current gain, structure (Homo-junction or hetero-junction), and geometrical parameters, resulting to be a primary thermometer. This proposition has been tested using off the shelf silicon transistors at thermal equilibrium with water at its triple point, the transistor temperature values obtained involve an uncertainty of a few milli-Kelvin. This proposition has been successfully tested in the temperature range of 77–450 K.

  6. A gallium phosphide high-temperature bipolar junction transistor

    NASA Technical Reports Server (NTRS)

    Zipperian, T. E.; Dawson, L. R.; Chaffin, R. J.

    1981-01-01

    Preliminary results are reported on the development of a high temperature (350 C) gallium phosphide bipolar junction transistor (BJT) for geothermal and other energy applications. This four-layer p(+)n(-)pp(+) structure was formed by liquid phase epitaxy using a supercooling technique to insure uniform nucleation of the thin layers. Magnesium was used as the p-type dopant to avoid excessive out-diffusion into the lightly doped base. By appropriate choice of electrodes, the device may also be driven as an n-channel junction field-effect transistor. The initial design suffers from a series resistance problem which limits the transistor's usefulness at high temperatures.

  7. Bipolar junction transistor models for circuit simulation of cosmic-ray-induced soft errors

    NASA Technical Reports Server (NTRS)

    Benumof, R.; Zoutendyk, J.

    1984-01-01

    This paper examines bipolar junction transistor models suitable for calculating the effects of large excursions of some of the variables determining the operation of a transistor. Both the Ebers-Moll and Gummel-Poon models are studied, and the junction and diffusion capacitances are evaluated on the basis of the latter model. The most interesting result of this analysis is that a bipolar junction transistor when struck by a cosmic particle may cause a single event upset in an electronic circuit if the transistor is operated at a low forward base-emitter bias.

  8. Bipolar junction transistor models for circuit simulation of cosmic-ray-induced soft errors

    NASA Astrophysics Data System (ADS)

    Benumof, R.; Zoutendyk, J.

    1984-11-01

    This paper examines bipolar junction transistor models suitable for calculating the effects of large excursions of some of the variables determining the operation of a transistor. Both the Ebers-Moll and Gummel-Poon models are studied, and the junction and diffusion capacitances are evaluated on the basis of the latter model. The most interesting result of this analysis is that a bipolar junction transistor when struck by a cosmic particle may cause a single event upset in an electronic circuit if the transistor is operated at a low forward base-emitter bias.

  9. On noise sources in hot electron-degraded bipolar junction transistors

    NASA Astrophysics Data System (ADS)

    Llinares, P.; Ghibaudo, G.; Chroboczek, J. A.

    1997-09-01

    The effects of electrical stress on static characteristics and power spectral density, SIb, of base current, Ib, fluctuations at low frequencies, f<1 kHz, have been studied in quasiself-aligned bipolar n-p-n junction. In as-fabricated devices SIb∝1/AE, where AE is the transistor emitter area, whereas in strongly degraded transistors Sib∝1/PE, where PE is the transistor perimeter. The latter demonstrates directly that hot carrier-induced noise sources are generated at the periphery of the transistors, in agreement with former work on hot electron-induced aging of bipolar junction transistors.

  10. Theoretical values of various parameters in the Gummel-Poon model of a bipolar junction transistor

    NASA Technical Reports Server (NTRS)

    Benumof, R.; Zoutendyk, J.

    1986-01-01

    Various parameters in the Gummel-Poon model of a bipolar junction transistor are expressed in terms of the basic structure of a transistor. A consistent theoretical approach is used which facilitates an understanding of the foundations and limitations of the derived formulas. The results enable one to predict how changes in the geometry and composition of a transistor would affect performance.

  11. Sensitivities of bipolar junction transistor electrical parameters to processing variables

    NASA Astrophysics Data System (ADS)

    Abdulkarim, H. S.

    1980-03-01

    Variations and sensitivities of bipolar junction transistor (BJT) electrical parameters to processing variables were examined. The functional dependence of these sensitivities on the processing schedule employed was estimated. Some design criteria or guidelines that should be followed to reduce the sensitivities of electrical parameters and to minimize yield loss were determined. The BJT parameters considered were electrical parameters of the Ebers-Moll and hybrid-pi models, as well as some device parameters that were useful for the characterization of processing results. The processing variables considered were time and temperature for each of the processing steps of the double diffusion method, physical constants that influence the impurity distribution in silicon, and device dimensions. In evaluating the impurity atom distribution, the diffusion coefficient was assumed to be independent of impurity concentration and the superposition model was assumed for the interaction of the two oppositely charged impurities. In evaluating the electrical parameters, use of a one dimensional model and the modified Moll-Ross relations were assumed to be adequate in relating variations in electrical characteristics to variations in processing variables and physical properties.

  12. Using Animation to Improve the Students' Academic Achievement on Bipolar Junction Transistor

    ERIC Educational Resources Information Center

    Zoabi, W.; Sabag, N.; Gero, A.

    2012-01-01

    Teaching abstract subjects to students studying towards a degree in electronics practical engineering (a degree between a technician and an engineer) requires didactic tools that enable understanding of issues without using advanced mathematics and physics. One basic issue is the BJT (Bipolar Junction Transistor) that requires preliminary…

  13. Junction-to-Case Thermal Resistance of a Silicon Carbide Bipolar Junction Transistor Measured

    NASA Technical Reports Server (NTRS)

    Niedra, Janis M.

    2006-01-01

    Junction temperature of a prototype SiC-based bipolar junction transistor (BJT) was estimated by using the base-emitter voltage (V(sub BE)) characteristic for thermometry. The V(sub BE) was measured as a function of the base current (I(sub B)) at selected temperatures (T), all at a fixed collector current (I(sub C)) and under very low duty cycle pulse conditions. Under such conditions, the average temperature of the chip was taken to be the same as that of the temperature-controlled case. At increased duty cycle such as to substantially heat the chip, but same I(sub C) pulse height, the chip temperature was identified by matching the V(sub BE) to the thermometry curves. From the measured average power, the chip-to-case thermal resistance could be estimated, giving a reasonable value. A tentative explanation for an observed bunching with increasing temperature of the calibration curves may relate to an increasing dopant atom ionization. A first-cut analysis, however, does not support this.

  14. Bipolar Junction Transistors in Two-Dimensional WSe2 with Large Current and Photocurrent Gains.

    PubMed

    Agnihotri, Pratik; Dhakras, Prathamesh; Lee, Ji Ung

    2016-07-13

    In the development of semiconductor devices, the bipolar junction transistor (BJT) features prominently as being the first solid state transistor that helped to usher in the digital revolution. For any new semiconductor, therefore, the fabrication and characterization of the BJT are important for both technological importance and historical significance. Here, we demonstrate a BJT device in exfoliated TMD semiconductor WSe2. We use buried gates to electrostatically create doped regions with back-to-back p-n junctions. We demonstrate two central characteristics of a bipolar device: current gain when operated as a BJT and a photocurrent gain when operated as a phototransistor. We demonstrate a current gain of 1000 and photocurrent gain of 40 and describe features that enhance these properties due to the doping technique that we employ. PMID:27336742

  15. An improved bipolar junction transistor model for electrical and radiation effects

    SciTech Connect

    Kleiner, C.T.; Messenger, G.C.

    1982-12-01

    The use of bipolar technology in hardened electronic design requires an in-depth understanding of how the Bipolar Junction Transistor (BJT) behaves under normal electrical and radiation environments. Significant improvements in BJT process technology have been reported, and the successful use of sophisticated Computer Aided Design (CAD) tools has aided implementation with respect to specific families of hardened devices. The most advanced BJT model used to date is the Improved Gummel-Poon (IGP) model which is used in CAA programs such as the SPICE II and SLICE programs. The earlier Ebers-Moll model (ref 1 and 2) has also been updated to compare with the older Gummel-Poon model. This paper describes an adaptation of an existing computer model which incorporates the best features of both models into a new, more accurate model called the Improved Bipolar Junction Transistor model. This paper also describes a unique approach to data reduction for the B(I /SUB c/) and V /SUB BE/(ACT) vs I /SUB c/characterizations which has been successfully programmed in Basic using a Commodore PET computer. This model is described in the following sections.

  16. Large-scale transient sensitivity analysis of a radiation damaged bipolar junction transistor.

    SciTech Connect

    Hoekstra, Robert John; Gay, David M.; Bartlett, Roscoe Ainsworth; Phipps, Eric Todd

    2007-11-01

    Automatic differentiation (AD) is useful in transient sensitivity analysis of a computational simulation of a bipolar junction transistor subject to radiation damage. We used forward-mode AD, implemented in a new Trilinos package called Sacado, to compute analytic derivatives for implicit time integration and forward sensitivity analysis. Sacado addresses element-based simulation codes written in C++ and works well with forward sensitivity analysis as implemented in the Trilinos time-integration package Rythmos. The forward sensitivity calculation is significantly more efficient and robust than finite differencing.

  17. Urea biosensor based on an extended-base bipolar junction transistor.

    PubMed

    Sun, Tai-Ping; Shieh, Hsiu-Li; Liu, Chun-Lin; Chen, Chung-Yuan

    2014-01-01

    In this study, a urea biosensor was prepared by the immobilization of urease onto the sensitive membrane of an extended-base bipolar junction transistor. The pH variation was used to detect the concentration of urea. The SnO2/ITO glass, fabricated by sputtering SnO2 on the conductive ITO glass, was used as a pH-sensitive membrane, which was connected with a commercial bipolar junction transistor device. The gels, fabricated by the poly vinyl alcohol with pendent styrylpyridinium groups, were used to immobilize the urease. This readout circuit, fabricated in a 0.35-um CMOS 2P4M process, operated at 3.3V supply voltage. This circuit occupied an area of 1.0 mm × 0.9 mm. The dynamic range of the urea biosensor was from 1.4 to 64 mg/dl at the 10 mM phosphate buffer solution and the sensitivity of this range was about 65.8 mV/pUrea. The effect of urea biosensors with different pH values was considered, and the characteristics of urea biosensors based on EBBJT were described. PMID:24211878

  18. Implementation of total dose effects in the bipolar junction transistor Gummel-Poon model

    SciTech Connect

    Montagner, X.; Fouillat, P.; Briand, R.; Touboul, A.; Schrimpf, R.D.; Galloway, K.F.; Calvet, M.C.; Calvel, P.

    1997-12-01

    The effects of total dose on the SPICE model of bipolar junction transistors are investigated. The limitations of the standard Gummel-Poon model for simulating the radiation-induced excess base current are analyzed, and a new model based on an empirical approach is proposed. Four new SPICE rad-parameters are presented, and investigated for different dose rates. The relevant parameters are extracted using a new algorithmic procedure, combining a genetic approach and the standard optimization technique which minimizes the RMS error between measured and simulated excess base current. It is shown that the excess base current is accurately described by the same formula whatever the device type is. An empirical fitting of the rad-parameters as a function of total dose is proposed to use in hardening electronic circuits for space-like environments.

  19. Simulation of neutron displacement damage in bipolar junction transistors using high-energy heavy ion beams.

    SciTech Connect

    Doyle, Barney Lee; Buller, Daniel L.; Hjalmarson, Harold Paul; Fleming, Robert M; Bielejec, Edward Salvador; Vizkelethy, Gyorgy

    2006-12-01

    Electronic components such as bipolar junction transistors (BJTs) are damaged when they are exposed to radiation and, as a result, their performance can significantly degrade. In certain environments the radiation consists of short, high flux pulses of neutrons. Electronics components have traditionally been tested against short neutron pulses in pulsed nuclear reactors. These reactors are becoming less and less available; many of them were shut down permanently in the past few years. Therefore, new methods using radiation sources other than pulsed nuclear reactors needed to be developed. Neutrons affect semiconductors such as Si by causing atomic displacements of Si atoms. The recoiled Si atom creates a collision cascade which leads to displacements in Si. Since heavy ions create similar cascades in Si we can use them to create similar damage to what neutrons create. This LDRD successfully developed a new technique using easily available particle accelerators to provide an alternative to pulsed nuclear reactors to study the displacement damage and subsequent transient annealing that occurs in various transistor devices and potentially qualify them against radiation effects caused by pulsed neutrons.

  20. Design and simulation of oxide and doping engineered lateral bipolar junction transistors for high power applications

    NASA Astrophysics Data System (ADS)

    Loan, Sajad A.; Bashir, Faisal; Akhoon, M. Saqib; Alamoud, Abdulrahman M.

    2016-01-01

    In this paper, we propose new structures of lateral bipolar junction transistor (LBJT) on silicon on insulator (SOI) with improved performance. The proposed devices are lateral bipolar transistors with multi doping zone collector drift region and a thick buried oxide under the collector region. Calibrated simulation studies have revealed that the proposed devices have higher breakdown voltage than the conventional device, that too at higher drift doping concentration. This has resulted in improved tradeoff between the on-resistance and the breakdown voltage of the proposed devices. It has been observed that the proposed device with two collector drift doping zones and a buried oxide thick step results in ∼190% increase in the breakdown voltage than the conventional device. The further increase in the number of collector drift doping zones from two to three has increased the breakdown voltage by 260% than the conventional one. On comparing the proposed devices with the buried oxide double step devices, it has been found that an increase of ∼15-19% in the breakdown voltage is observed in the proposed devices even at higher drift doping concentrations. The use of higher drift doping concentration reduces the on-resistance of the proposed device and thus improves the tradeoff between the breakdown voltage and the on-resistance of the proposed device in comparison to buried oxide double step devices. Further, the use of step doping in the collector drift region has resulted in the reduction of kink effect in the proposed device. Using the mixed mode simulations, the proposed devices have been tested at the circuit level, by designing and simulating inverting amplifiers employing the proposed devices. Both DC and AC analyses of the inverting amplifiers have shown that the proposed devices work well at the circuit level. It has been observed that there is a slight increase in ON delay in the proposed device; however, the OFF delay is more or less same as that of the

  1. Radiation-induced 1/f noise degradation of PNP bipolar junction transistors at different dose rates

    NASA Astrophysics Data System (ADS)

    Qi-Feng, Zhao; Yi-Qi, Zhuang; Jun-Lin, Bao; Wei, Hu

    2016-04-01

    It is found that ionizing-radiation can lead to the base current and the 1/f noise degradations in PNP bipolar junction transistors. In this paper, it is suggested that the surface of the space charge region of the emitter-base junction is the main source of the base surface 1/f noise. A model is developed which identifies the parameters and describes their interactive contributions to the recombination current at the surface of the space charge region. Based on the theory of carrier number fluctuation and the model of surface recombination current, a 1/f noise model is developed. This model suggests that 1/f noise degradations are the result of the accumulation of oxide-trapped charges and interface states. Combining models of ELDRS, this model can explain the reason why the 1/f noise degradation is more severe at a low dose rate than at a high dose rate. The radiations were performed in a Co60 source up to a total dose of 700 Gy(Si). The low dose rate was 0.001 Gy(Si)/s and the high dose rate was 0.1 Gy(Si)/s. The model accords well with the experimental results. Project supported by the National Natural Science Foundation of China (Grant Nos. 61076101 and 61204092).

  2. An improved bipolar junction transistor model for electrical and radiation effects

    NASA Astrophysics Data System (ADS)

    Kleiner, C. T.; Messenger, G. C.

    1982-12-01

    A bipolar transistor model is introduced which combines most of the best features of the modified Ebers-Moll (1954) model with the Gummel-Poon (1970) model. The model is constructed of two modified Ebers-Moll models with the addition of junction and basewidth modulation to account for leakage current dependence on reverse voltage and beta dependence on collector-emitter voltage. The electrical characteristics that can be obtained with the model include: nonlinear beta and V(BE) vs normal I(C) and/or inverted I(E); increase in f(T) from low injection to peak beta and decrease in f(T) beyond peak beta; nonlinear R(CX) vs I(C) and V(CE); inclusion of base-width modulation as a function of reverse bias for V(CB) or V(EB); and inclusion of junction leakage as a function of reverse bias. Radiation characteristics that can be obtained include: photocurrent generation and saturation including photocurrent response time; dose-rate modulation of resistors; inclusion of neutron damage constant as a function of injection level and incorporation of fast annealing; inclusion of temperature dependence.

  3. Analysis of generation and annihilation of deep level defects in a silicon-irradiated bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Madhu, K. V.; Kulkarni, S. R.; Ravindra, M.; Damle, R.

    2007-08-01

    A commercial bipolar junction transistor (2 N 2219 A, npn), irradiated with 120 MeV Si9+ ions with a fluence of the order of 1012 ions cm-2, is studied for radiation-induced gain degradation and deep level defects. I-V measurements are made to study the gain degradation as a function of ion fluence. Properties such as activation energy, trap concentration and capture cross section of deep levels are studied by deep level transient spectroscopy (DLTS). Minority carrier trap energy levels with energies ranging from EC - 0.160 eV to EC - 0.581 eV are observed in the base-collector junction of the transistor. Majority carrier trap levels are also observed with energies ranging from EV + 0.182 eV to EV + 0.401 eV. The identification of the defect type is made on the basis of its finger prints such as activation energy, annealing temperature and capture cross section by comparing with those reported in the literature. New energy levels for the defects A-center, di-vacancy and Si-interstitial are also observed. The irradiated transistor is subjected to isothermal and isochronal annealing. The defects are seen to anneal above 250 °C. The defects generated in the base region of the transistor by displacement damage appear to be responsible for transistor gain degradation.

  4. Effect of thin emitter set-back layer on GaAs delta-doped emitter bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Lew, K. L.; Yoon, S. F.

    2005-05-01

    GaAs delta-doped emitter bipolar junction transistors (δ-BJT) with different emitter set-back layer thicknesses of 10to50nm were fabricated to study the emitter set-back layer thickness effect on device dc performance. We found that the current gain decreases following decrease in the emitter set-back layer thickness. A detailed analysis was performed to explain this phenomenon, which is believed to be caused by reduction of the effective barrier height in the δ-BJT. This is due to change in the electric-field distribution in the delta-doped structure caused by the built-in potential of the base-emitter (B-E ) junction. Considering the recombination and barrier height reduction effects, the thickness of the emitter set-back layer should be designed according to the B-E junction depletion width with a tolerance of ±5nm. The dc performance of a δ-BJT designed based on this criteria is compared to that of a Al0.25Ga0.75As /GaAs heterojunction bipolar transistor (HBT). Both devices employed base doping of 2×1019cm-3 and base-to-emitter doping ratio of 40. Large emitter area (AE≈1.6×10-5cm-2) and small emitter area (AE≈1.35×10-6cm-2) device current gains of 40 and 20, respectively, were obtained in both types of transistors passivated by (NH4)2S treatment. The measured current gain of the GaAs δ-BJT is the highest reported for a homojunction device with such high base-to-emitter doping ratio normally used in HBT devices.

  5. Evaluation of Enhanced Low Dose Rate Sensitivity in Discrete Bipolar Junction Transistors

    NASA Technical Reports Server (NTRS)

    Chen, Dakai; Ladbury Raymond; LaBel, Kenneth; Topper, Alyson; Ladbury, Raymond; Triggs, Brian; Kazmakites, Tony

    2012-01-01

    We evaluate the low dose rate sensitivity in several families of discrete bipolar transistors across device parameter, quality assurance level, and irradiation bias configuration. The 2N2222 showed the most significant low dose rate sensitivity, with low dose rate enhancement factor of 3.91 after 100 krad(Si). The 2N2907 also showed critical degradation levels. The devices irradiated at 10 mrad(Si)/s exceeded specifications after 40 and 50 krad(Si) for the 2N2222 and 2N2907 devices, respectively.

  6. Low Gate Voltage Operated Multi-emitter-dot H+ Ion-Sensitive Gated Lateral Bipolar Junction Transistor

    NASA Astrophysics Data System (ADS)

    Yuan, Heng; Zhang, Ji-Xing; Zhang, Chen; Zhang, Ning; Xu, Li-Xia; Ding, Ming; Patrick, J. Clarke

    2015-02-01

    A low gate voltage operated multi-emitter-dot gated lateral bipolar junction transistor (BJT) ion sensor is proposed. The proposed device is composed of an arrayed gated lateral BJT, which is driven in the metal-oxide-semiconductor field-effect transistor (MOSFET)-BJT hybrid operation mode. Further, it has multiple emitter dots linked to each other in parallel to improve ionic sensitivity. Using hydrogen ionic solutions as reference solutions, we conduct experiments in which we compare the sensitivity and threshold voltage of the multi-emitter-dot gated lateral BJT with that of the single-emitter-dot gated lateral BJT. The multi-emitter-dot gated lateral BJT not only shows increased sensitivity but, more importantly, the proposed device can be operated under very low gate voltage, whereas the conventional ion-sensitive field-effect transistors cannot. This special characteristic is significant for low power devices and for function devices in which the provision of a gate voltage is difficult.

  7. Limit of validity of the thermionic-field-emission treatment of electron injection across emitter-base junctions in abrupt heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Kumar, T.; Cahay, M.; Shi, S.; Roenker, K.; Stanchina, W. E.

    1995-06-01

    A hybrid model is developed to simulate electron transport through the emitter-base heterojunction and the base region of abrupt heterojunction bipolar transistors. The energy distribution of the injected electron flux through the emitter-base junction is calculated using a rigorous quantum-mechanical treatment of electron tunneling and thermionic emission across the spike at the emitter-base junction. The results are compared with those predicted by the conventional thermionic-field-emission model. For both models, the electron fluxes injected across the emitter-base junction are used as initial energy distributions in a regional Monte Carlo calculation to model electron transport through the base. The average base transit times are calculated using the impulse response technique as a function of the emitter-base voltage. The differences between the thermionic-field-emission model and the rigorous quantum-mechanical approaches to model electron transport through abrupt heterojunction bipolar transistors are pointed out.

  8. MOSFET-BJT hybrid mode of the gated lateral bipolar junction transistor for C-reactive protein detection.

    PubMed

    Yuan, Heng; Kwon, Hyurk-Choon; Yeom, Se-Hyuk; Kwon, Dae-Hyuk; Kang, Shin-Won

    2011-10-15

    In this study, we propose a novel biosensor based on a gated lateral bipolar junction transistor (BJT) for biomaterial detection. The gated lateral BJT can function as both a BJT and a metal-oxide-semiconductor field-effect transistor (MOSFET) with both the emitter and source, and the collector and drain, coupled. C-reactive protein (CRP), which is an important disease marker in clinical examinations, can be detected using the proposed device. In the MOSFET-BJT hybrid mode, the sensitivity, selectivity, and reproducibility of the gated lateral BJT for biosensors were evaluated in this study. According to the results, in the MOSFET-BJT hybrid mode, the gated lateral BJT shows good selectivity and reproducibility. Changes in the emitter (source) current of the device for CRP antigen detection were approximately 0.65, 0.72, and 0.80 μA/decade at base currents of -50, -30, and -10 μA, respectively. The proposed device has significant application in the detection of certain biomaterials that require a dilution process using a common biosensor, such as a MOSFET-based biosensor. PMID:21835604

  9. Non-ideal effect in 4H-SiC bipolar junction transistor with double Gaussian-doped base

    NASA Astrophysics Data System (ADS)

    Yuan, Lei; Zhang, Yu-Ming; Song, Qing-Wen; Tang, Xiao-Yan; Zhang, Yi-Men

    2015-06-01

    The non-ideal effect of 4H-SiC bipolar junction transistor (BJT) with a double Gaussian-doped base is characterized and simulated in this paper. By adding a specific interface model between SiC and SiO2, the simulation results are in good agreement with the experiment data. An obvious early effect is found from the output characteristic. As the temperature rises, the early voltage increases, while the current gain gradually decreases, which is totally different from the scenario of silicon BJT. With the same effective Gummel number in the base region, the double Gaussian-doped base structure can realize higher current gain than the single base BJT due to the built-in electric field, whereas the early effect will be more salient. Besides, the emitter current crowding effect is also analyzed. Due to the low sheet resistance in the first highly-doped base epilayer, the 4H-BJT with a double base has more uniform emitter current density across the base-emitter junction, leading to better thermal stability. Project supported by the National Natural Science Foundation of China (Grant Nos. 60876061 and 61234006), the Natural Science Foundation of Shaanxi Province, China (Grant No. 2013JQ8012), and the Doctoral Fund of the Ministry of Education of China (Grant Nos. 20130203120017 and 20110203110010).

  10. A novel 4H-SiC lateral bipolar junction transistor structure with high voltage and high current gain

    NASA Astrophysics Data System (ADS)

    Deng, Yong-Hui; Xie, Gang; Wang, Tao; Sheng, Kuang

    2013-09-01

    In this paper, a novel structure of a 4H-SiC lateral bipolar junction transistor (LBJT) with a base field plate and double RESURF in the drift region is presented. Collector-base junction depletion extension in the base region is restricted by the base field plate. Thin base as well as low base doping of the LBJT therefore can be achieved under the condition of avalanche breakdown. Simulation results show that thin base of 0.32 μm and base doping of 3 × 1017 cm-3 are obtained, and corresponding current gain is as high as 247 with avalanche breakdown voltage of 3309 V when the drift region length is 30 μm. Besides, an investigation of a 4H-SiC vertical BJT (VBJT) with comparable breakdown voltage (3357 V) shows that the minimum base width of 0.25 μm and base doping as high as 8 × 1017 cm-3 contribute to a maximum current gain of only 128.

  11. Switching Characteristics of a 4H-SiC Based Bipolar Junction Transistor to 200 C

    NASA Technical Reports Server (NTRS)

    Niedra, Janis M.

    2006-01-01

    Static curves and resistive load switching characteristics of a 600 V, 4 A rated, SiC-based NPN bipolar power transistor (BJT) were observed at selected temperatures from room to 200 C. All testing was done in a pulse mode at low duty cycle (approx.0.1 percent). Turn-on was driven by an adjustable base current pulse and turn-off was accelerated by a negative base voltage pulse of 7 V. These base drive signals were implemented by 850 V, gated power pulsers, having rise-times of roughly 10 ns, or less. Base charge sweep-out with a 7 V negative pulse did not produce the large reverse base current pulse seen in a comparably rated Si-based BJT. This may be due to a very low charge storage time. The decay of the collector current was more linear than its exponential-like rise. Switching observations were done at base drive currents (I(sub B)) up to 400 mA and collector currents (I(sub C)) up to 4 A, using a 100 Omega non-inductive load. At I(sub B) = 400 mA and I(sub C) = 4 A, turn-on times typically varied from 80 to 94 ns, over temperatures from 23 to 200 C. As expected, lowering the base drive greatly extended the turn-on time. Similarly, decreasing the load current to I(sub C) = 1 A with I(sub B) = 400 mA produced turn-on times as short as 34 ns. Over the 23 to 200 C range, with I(sub B) = 400 mA and I(sub C) = 4 A, turn-off times were in the range of 72 to 84 ns with the 7 V sweep-out.

  12. An Ebers-Moll model for the heterostructure bipolar transistor

    NASA Astrophysics Data System (ADS)

    Lundstrom, M. S.

    1986-11-01

    An Ebers-Moll model for the heterostructure bipolar transistor (HBT) is developed. The model describes both single and double heterojunction transistors with or without band spikes and applies to uniform or graded base HBTs. Model parameters are directly related to device parameters such as doping densities, dimensions and band spikes. Junction velocities are introduced to describe the transport of carriers across the junctions. Results demonstrate that even for compositionally graded junctions, transport across the junctions may limit HBT performance if the base is graded. Use of the model is illustrated by examining a recently proposed technique for extracting conduction band spikes by comparing forward and inverted I- V characteristics.

  13. Noise modeling of microwave heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Escotte, Laurent; Roux, Jean-Phillippe; Plana, Robert; Graffeuil, Jacques; Gruhle, Andreas

    1995-05-01

    Analytical expressions of microwave heterojunction bipolar transistors minimum noise figure and noise parameter are reported in this paper. These expressions are derived from a noise model including nonideal junctions, emitter and base resistances and have been compared with measured data obtained on a Si/SiGe HBT. An agreement between theoretical and experimental data was observed up to 20 GHz for several bias conditions. The limits of the model or the range of validity of the proposed equations have been also examined with the help of an appropriate CAD software. The analysis of the influence of parasitic elements on noise parameters has shown a strong influence of the extrinsic base collector capacitance at microwave frequencies.

  14. Total Dose Effects in Conventional Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Johnston, A. H.; Swift, G. W.; Rax, B. G.

    1994-01-01

    This paper examines various factors in bipolar device construction and design, and discusses their impact on radiation hardness. The intent of the paper is to improve understanding of the underlying mechanisms for practical devices without special test structures, and to provide (1) guidance in ways to select transistor designs that are more resistant to radiation damage, and (2) methods to estimate the maximum amount of damage that might be expected from a basic transistor design. The latter factor is extremely important in assessing the risk that future lots of devices will be substantially below design limits, which are usually based on test data for older devices.

  15. Complementary junction heterostructure field-effect transistor

    DOEpatents

    Baca, Albert G.; Drummond, Timothy J.; Robertson, Perry J.; Zipperian, Thomas E.

    1995-01-01

    A complimentary pair of compound semiconductor junction heterostructure field-effect transistors and a method for their manufacture are disclosed. The p-channel junction heterostructure field-effect transistor uses a strained layer to split the degeneracy of the valence band for a greatly improved hole mobility and speed. The n-channel device is formed by a compatible process after removing the strained layer. In this manner, both types of transistors may be independently optimized. Ion implantation is used to form the transistor active and isolation regions for both types of complimentary devices. The invention has uses for the development of low power, high-speed digital integrated circuits.

  16. Complementary junction heterostructure field-effect transistor

    DOEpatents

    Baca, A.G.; Drummond, T.J.; Robertson, P.J.; Zipperian, T.E.

    1995-12-26

    A complimentary pair of compound semiconductor junction heterostructure field-effect transistors and a method for their manufacture are disclosed. The p-channel junction heterostructure field-effect transistor uses a strained layer to split the degeneracy of the valence band for a greatly improved hole mobility and speed. The n-channel device is formed by a compatible process after removing the strained layer. In this manner, both types of transistors may be independently optimized. Ion implantation is used to form the transistor active and isolation regions for both types of complimentary devices. The invention has uses for the development of low power, high-speed digital integrated circuits. 10 figs.

  17. The Ebers-Moll model for magnetic bipolar transistors

    NASA Astrophysics Data System (ADS)

    Fabian, Jaroslav; Žutić, Igor

    2005-03-01

    The equivalent electrical circuit of the Ebers-Moll-type is introduced for magnetic bipolar transistors. In addition to conventional diodes and current sources, the new circuit comprises two novel elements due to spin-charge coupling. A classification scheme of the operating modes of magnetic bipolar transistors in the low bias regime is presented.

  18. Generalization of Moll Ross relations for heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Mohammad, S. Noor

    2002-04-01

    Moll-Ross relations for the current flow through the base region of a bipolar transistor, and for the base transit time, have been generalized for heterojunction bipolar transistors with a nonuniform energy bandgap in the base region. The effect of both heavy doping and carrier degeneracy has been taken into account.

  19. Thermal design studies of high-power heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Gao, Guang-Bo; Wang, Ming-Zhu; Gui, Xiang; Morkoc, Hadis

    1989-05-01

    A theoretical thermoelectro-feedback model has been developed for the thermal design of high-power GaAlAs/GaAs heterojunction bipolar transistors (HBTs). The power-handling capability, thermal instability, junction temperature, and current distributions of HBTs with multiple emitter fingers have been numerically studied. The calculated results indicate that power HBTs on Si substrates (or with Si as the collector) have excellent potential power performance and reliability. The power-handling capability on Si is 3.5 and 2.7 times as large as that on GaAs and InP substrates, respectively. The peak junction temperature and temperature difference on the chip decrease in comparison to the commonly used Si homostructure power transistors with the same geometry and power dissipation. Thereby HBTs are promising for high-speed microwave and millimeter-wave applications. It has been also found that the nonuniform distribution of junction temperature and current can be greatly improved by a balasting technique that uses unequal-value emitter resistors.

  20. Dose Rate Effects in Linear Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Johnston, Allan; Swimm, Randall; Harris, R. D.; Thorbourn, Dennis

    2011-01-01

    Dose rate effects are examined in linear bipolar transistors at high and low dose rates. At high dose rates, approximately 50% of the damage anneals at room temperature, even though these devices exhibit enhanced damage at low dose rate. The unexpected recovery of a significant fraction of the damage after tests at high dose rate requires changes in existing test standards. Tests at low temperature with a one-second radiation pulse width show that damage continues to increase for more than 3000 seconds afterward, consistent with predictions of the CTRW model for oxides with a thickness of 700 nm.

  1. Perpendicular transport in superlattice bipolar transistors (SBT)

    NASA Astrophysics Data System (ADS)

    Sibille, A.; Palmier, J. F.; Minot, C.; Harmand, J. C.; Dubon-Chevallier, C.

    Diffusion-limited electron transport in superlattices is studied by gain measurements on heterojunction bipolar transistors with a {GaAs}/{GaAlAs} superlattice base. In the case of thin barriers, Bloch conduction is observed, while hopping between localized levels prevails for large barriers. A transition occurs between these two regimes, localization being achieved when the energy broadening induced by the electron-phonon coupling added to the disorder due to imperfect growth is of the order of the miniband width. This interpretation is supported by temperature dependence measurements of the perpendicular mobilities in relation with theoretical calculations of these mobilities.

  2. Hardening measures for bipolar transistors against microwave-induced damage

    NASA Astrophysics Data System (ADS)

    Chai, Chang-Chun; Ma, Zhen-Yang; Ren, Xing-Rong; Yang, Yin-Tang; Zhao, Ying-Bo; Yu, Xin-Hai

    2013-06-01

    In the present paper we study the influences of the bias voltage and the external components on the damage progress of a bipolar transistor induced by high-power microwaves. The mechanism is presented by analyzing the variation in the internal distribution of the temperature in the device. The findings show that the device becomes less vulnerable to damage with an increase in bias voltage. Both the series diode at the base and the relatively low series resistance at the emitter, Re, can obviously prolong the burnout time of the device. However, Re will aid damage to the device when the value is sufficiently high due to the fact that the highest hot spot shifts from the base-emitter junction to the base region. Moreover, the series resistance at the base Rb will weaken the capability of the device to withstand microwave damage.

  3. Gallium nitride junction field-effect transistor

    DOEpatents

    Zolper, J.C.; Shul, R.J.

    1999-02-02

    An ion implanted gallium-nitride (GaN) junction field-effect transistor (JFET) and method of making the same are disclosed. Also disclosed are various ion implants, both n- and p-type, together with or without phosphorus co-implantation, in selected III-V semiconductor materials. 19 figs.

  4. Gallium nitride junction field-effect transistor

    DOEpatents

    Zolper, John C.; Shul, Randy J.

    1999-01-01

    An all-ion implanted gallium-nitride (GaN) junction field-effect transistor (JFET) and method of making the same. Also disclosed are various ion implants, both n- and p-type, together with or without phosphorous co-implantation, in selected III-V semiconductor materials.

  5. Review of Heterojunctin Bipolar Transistor Structure, Applications, and Reliability

    NASA Technical Reports Server (NTRS)

    Lee, C.; Kayali, S.

    1993-01-01

    Heterojunction Bipolar Transistors (HBTs) are increasingly employed in high frequency, high linerity, and high efficiency applications. As the utilization of these devices becomes more widespread, their operation will be viewed with more scrutiny.

  6. Experimental Analysis of Proton-Induced Displacement and Ionization Damage Using Gate-Controlled Lateral PNP Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Ball, D. R.; Schrimpf, R. D.; Barnaby, H. J.

    2006-01-01

    The electrical characteristics of proton-irradiated bipolar transistors are affected by ionization damage to the insulating oxide and displacement damage to the semiconductor bulk. While both types of damage degrade the transistor, it is important to understand the mechanisms individually and to be able to analyze them separately. In this paper, a method for analyzing the effects of ionization and displacement damage using gate-controlled lateral PNP bipolar junction transistors is described. This technique allows the effects of oxide charge, surface recombination velocity, and bulk traps to be measured independently.

  7. Advanced insulated gate bipolar transistor gate drive

    DOEpatents

    Short, James Evans; West, Shawn Michael; Fabean, Robert J.

    2009-08-04

    A gate drive for an insulated gate bipolar transistor (IGBT) includes a control and protection module coupled to a collector terminal of the IGBT, an optical communications module coupled to the control and protection module, a power supply module coupled to the control and protection module and an output power stage module with inputs coupled to the power supply module and the control and protection module, and outputs coupled to a gate terminal and an emitter terminal of the IGBT. The optical communications module is configured to send control signals to the control and protection module. The power supply module is configured to distribute inputted power to the control and protection module. The control and protection module outputs on/off, soft turn-off and/or soft turn-on signals to the output power stage module, which, in turn, supplies a current based on the signal(s) from the control and protection module for charging or discharging an input capacitance of the IGBT.

  8. Npn double heterostructure bipolar transistor with ingaasn base region

    DOEpatents

    Chang, Ping-Chih; Baca, Albert G.; Li, Nein-Yi; Hou, Hong Q.; Ashby, Carol I. H.

    2004-07-20

    An NPN double heterostructure bipolar transistor (DHBT) is disclosed with a base region comprising a layer of p-type-doped indium gallium arsenide nitride (InGaAsN) sandwiched between n-type-doped collector and emitter regions. The use of InGaAsN for the base region lowers the transistor turn-on voltage, V.sub.on, thereby reducing power dissipation within the device. The NPN transistor, which has applications for forming low-power electronic circuitry, is formed on a gallium arsenide (GaAs) substrate and can be fabricated at commercial GaAs foundries. Methods for fabricating the NPN transistor are also disclosed.

  9. Heterojunction bipolar transistor technology for data acquisition and communication

    NASA Technical Reports Server (NTRS)

    Wang, C.; Chang, M.; Beccue, S.; Nubling, R.; Zampardi, P.; Sheng, N.; Pierson, R.

    1992-01-01

    Heterojunction Bipolar Transistor (HBT) technology has emerged as one of the most promising technologies for ultrahigh-speed integrated circuits. HBT circuits for digital and analog applications, data conversion, and power amplification have been realized, with speed performance well above 20 GHz. At Rockwell, a baseline AlGaAs/GaAs HBT technology has been established in a manufacturing facility. This paper describes the HBT technology, transistor characteristics, and HBT circuits for data acquisition and communication.

  10. Simulation of GaN/AlGaN heterojunction bipolar transistors: part I npn structures

    NASA Astrophysics Data System (ADS)

    Cao, X. A.; Van Hove, J. M.; Klaassen, J. J.; Polley, C. J.; Wowchak, A. M.; Chow, P. P.; King, D. J.; Zhang, A. P.; Dang, G.; Monier, C.; Pearton, S. J.; Ren, F.

    2000-07-01

    A drift-diffusion model was employed to calculate the dc performance of GaN/AlGaN heterojunction bipolar transistors (HBTs). The dc current gain was found to vary from ˜7 to 60 for collector currents of 10 -12-10 -2 A in 100 μm contact diameter devices with 2000 Å thick p-GaN base layers (P=2×10 17 cm-3) . The effects of base grading, base thickness, minority carrier lifetime and mobility in the base, base contact resistance and device operating temperature (25-300°C) were examined. The HBTs were found to have a significantly better gain at low collector current densities than the GaN bipolar junction transistors, due to the valence band offset.

  11. Bipolar Transistors Can Detect Charge in Electrostatic Experiments

    ERIC Educational Resources Information Center

    Dvorak, L.

    2012-01-01

    A simple charge indicator with bipolar transistors is described that can be used in various electrostatic experiments. Its behaviour enables us to elucidate links between 'static electricity' and electric currents. In addition it allows us to relate the sign of static charges to the sign of the terminals of an ordinary battery. (Contains 7 figures…

  12. Experiments with Charge Indicator Based on Bipolar Transistors

    ERIC Educational Resources Information Center

    Dvorak, Leos; Planinsic, Gorazd

    2012-01-01

    A simple charge indicator with bipolar transistors described recently enables us to perform a number of experiments suitable for high-school physics. Several such experiments are presented and discussed in this paper as well as some features of the indicator important for its use in schools, namely its sensitivity and robustness, i.e. the…

  13. Total dose and dose rate models for bipolar transistors in circuit simulation.

    SciTech Connect

    Campbell, Phillip Montgomery; Wix, Steven D.

    2013-05-01

    The objective of this work is to develop a model for total dose effects in bipolar junction transistors for use in circuit simulation. The components of the model are an electrical model of device performance that includes the effects of trapped charge on device behavior, and a model that calculates the trapped charge densities in a specific device structure as a function of radiation dose and dose rate. Simulations based on this model are found to agree well with measurements on a number of devices for which data are available.

  14. Langevin approach to noise modelling of bipolar microwave transistors

    NASA Astrophysics Data System (ADS)

    Patti, F.; Miceli, V.; Spagnolo, B.

    2000-04-01

    We present a new approach to study the complete stochastic properties of fluctuations of the output current of microwave transistors. We obtain the π-hybrid model of bipolar microwave transistors with the noise internal sources starting from experimental on-wafer measurements of the scattering and noise parameters. We derive the stochastic differential equations of the Giacoletto model for different loads and source admittances. We give the analytical temporal behavior of the second moment of the output current, assuming particular given correlation functions between the internal noise sources.

  15. The high-volume production of heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Pan, N.; Hill, D.; Rose, C.; McCullough, D.; Rice, P.; Vu, D. P.; Hong, K.; Farley, C.

    1998-08-01

    The insertion of advanced microwave devices into high-volume applications is critically dependent upon a robust and reproducible epitaxial growth technology accompanied with a reproducible process technology. The precise control of the material and device parameters is essential to maintain a high-yield process, which leads to a low-cost product. Although AlGaAs/GaAs heterojunction bipolar transistors have been widely demonstrated in many company research laboratories and universities, the transition from a laboratory environment to high-volume production requires a thorough understanding of the metalorganic chemical vapor deposition growth process and its correlation with device performance. In this work, high-performance AlGaAs/GaAs heterojunction bipolar transistors grown by MOCVD with excellent control in the device parameter tolerances have been demonstrated in very high volumes.

  16. Vertical Bipolar Charge Plasma Transistor with Buried Metal Layer

    PubMed Central

    Nadda, Kanika; Kumar, M. Jagadesh

    2015-01-01

    A self-aligned vertical Bipolar Charge Plasma Transistor (V-BCPT) with a buried metal layer between undoped silicon and buried oxide of the silicon-on-insulator substrate, is reported in this paper. Using two-dimensional device simulation, the electrical performance of the proposed device is evaluated in detail. Our simulation results demonstrate that the V-BCPT not only has very high current gain but also exhibits high BVCEO · fT product making it highly suitable for mixed signal high speed circuits. The proposed device structure is also suitable for realizing doping-less bipolar charge plasma transistor using compound semiconductors such as GaAs, SiC with low thermal budgets. The device is also immune to non-ideal current crowding effects cropping up at high current densities. PMID:25597295

  17. Doping To Reduce Base Resistances Of Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Lin, True-Lon

    1991-01-01

    Modified doping profile proposed to reduce base resistance of bipolar transistors. A p/p+ base-doping profile reduces base resistance without reducing current gain. Proposed low/high base-doping profile realized by such low-temperature deposition techniques as molecular-beam epitaxy, ultra-high-vacuum chemical-vapor deposition, and limited-reaction epitaxy. Produces desired doping profiles without excessive diffusion of dopant.

  18. InP Heterojunction Bipolar Transistor Amplifiers to 255 GHz

    NASA Technical Reports Server (NTRS)

    Radisic, Vesna; Sawdai, Donald; Scott, Dennis; Deal, William; Dang, Linh; Li, Danny; Cavus, Abdullah; To, Richard; Lai, Richard

    2009-01-01

    Two single-stage InP heterojunction bipolar transistor (HBT) amplifiers operate at 184 and 255 GHz, using Northrop Grumman Corporation s InP HBT MMIC (monolithic microwave integrated circuit) technology. At the time of this reporting, these are reported to be the highest HBT amplifiers ever created. The purpose of the amplifier design is to evaluate the technology capability for high-frequency designs and verify the model for future development work.

  19. An improved junction capacitance model for junction field-effect transistors

    NASA Astrophysics Data System (ADS)

    Ding, Hao; Liou, Juin J.; Cirba, Claude R.; Green, Keith

    2006-07-01

    A new junction capacitance model for the four-terminal junction field-effect transistor (JFET) is presented. With a single expression, the model, which is valid for different temperatures and a wide range of bias conditions, describes correctly the JFET junction capacitance behavior and capacitance drop-off phenomenon. The model has been verified using experimental data measured at Texas Instruments.

  20. Correlated noise in bipolar transistors: Model implementation issues

    NASA Astrophysics Data System (ADS)

    Huszka, Zoltan; Chakravorty, Anjan

    2015-12-01

    A new orthogonalization scheme is suggested for implementing correlated noise of bipolar transistors. The scheme provides a necessary condition on the non-quasi-static (NQS) models that can be used to obtain an implementation-suitable correlated noise model. One of the solutions presented here corresponds to a single node realization not reported so far. The gm -factor is introduced in the noise analysis explaining the deviations of a former noise model from device simulations. The model is extended to include the collector space-charge-region induced noise by retaining the simplicity of the realization and preserving the model parameter count.

  1. The dc characteristics of GaAs/AlGaAs heterojunction bipolar transistors with application to device modeling

    NASA Astrophysics Data System (ADS)

    Hafizi, Madjid E.; Crowell, Clarence R.; Grupen, Matthew E.

    1990-10-01

    A complete dc model for the heterojunction bipolar transistor (HBT) is presented. The HBT dc characteristics are compared with the Ebers-Moll (EM) model for conventional bipolar junction transistors (BJTs). It is shown that, although the details of HBT operation can differ markedly from those of a BJT, a model and a parameter extraction technique can be developed which have physical meaning and are exactly compatible with the EM models widely used for BJTs. Device I-V measurements at 77 and 300 K are used to analyze HBT performance in the context of an EM model. A technique is developed to extract the device base, emitter, and collector series resistances directly from the measured I-V data without requiring an ideal base current as reference. Accuracies of the extracted series resistances are assessed. The ac parameters of HBTs are calculated numerically from the physical device structure and shown to be comparable to those of conventional BJTs.

  2. Auger recombination in heavily doped shallow-emitter silicon p-n-junction solar cells, diodes, and transistors

    NASA Technical Reports Server (NTRS)

    Shibib, M. A.; Lindholm, F. A.; Fossum, J. G.

    1979-01-01

    A rigorous analytic evaluation of an emitter model that includes Auger recombination but excludes bandgap narrowing is presented. It is shown that such a model cannot explain the experimentally observed values of the open-circuit voltage in p-n-junction silicon solar cells. Thus physical mechanisms in addition to Auger recombination are responsible for the experimentally observed values of the open-circuit voltage in silicon solar cells and the common-emitter current gain in bipolar transistors.

  3. Vapor grown silicon dioxide improves transistor base-collector junctions

    NASA Technical Reports Server (NTRS)

    Carley, D. R.; Duclos, R. A.

    1966-01-01

    Vapor grown silicon dioxide layer protects base-collector junction in silicon planar transistors during the emitter diffusion process. This oxide fills in any imperfections that exist in the thermally grown oxide layer and is of greater thickness than that layer. This process is used to deposit protective silicon dioxide coatings on optical surfaces.

  4. A hybrid model to calculate the forward delay time of heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Kumar, T.; Cahay, M.; Shi, S.; Roenker, K.; Stanchina, W. E.

    1995-07-01

    The forward delay time (τ F) of heterojunction bipolar transistors (HBTs) is calculated using a hybrid model of carrier transport. A rigorous quantum-mechanical treatment of electron tunneling and thermionic emission across the spike at the emitter-base junction is used to determine the energy of the electron flux injected into the base region. This flux is used as an initial distribution in a regional Monte Carlo simulator to model electron transport from base to sub-collector. In this paper, we estimate the base transit time using the impulse response technique and the collector delay time using the expression of Laux and Lai (IEEE Electron Device Letters, 11, 174, 1990). Improvements to the hybrid model proposed here to reduce some of the discrepancies between measured and calculated values of ƒ τ for some InAlAs/InGaAs and InP/InGaAs structures reported in the literature are discussed.

  5. Microwave damage susceptibility trend of a bipolar transistor as a function of frequency

    NASA Astrophysics Data System (ADS)

    Ma, Zhen-Yang; Chai, Chang-Chun; Ren, Xing-Rong; Yang, Yin-Tang; Chen, Bin; Song, Kun; Zhao, Ying-Bo

    2012-09-01

    We conduct a theoretical study of the damage susceptibility trend of a typical bipolar transistor induced by a high-power microwave (HPM) as a function of frequency. The dependences of the burnout time and the damage power on the signal frequency are obtained. Studies of the internal damage process and the mechanism of the device are carried out from the variation analysis of the distribution of the electric field, current density, and temperature. The investigation shows that the burnout time linearly depends on the signal frequency. The current density and the electric field at the damage position decrease with increasing frequency. Meanwhile, the temperature elevation occurs in the area between the p-n junction and the n-n+ interface due to the increase of the electric field. Adopting the data analysis software, the relationship between the damage power and frequency is obtained. Moreover, the thickness of the substrate has a significant effect on the burnout time.

  6. Microwave power heterojunction bipolar transistors fabricated with thermal shunt bathtub

    SciTech Connect

    Bozada, C.A.; Barlage, D.W.; Barrette, J.P.

    1995-12-31

    Heterojunction bipolar transistor devices and circuits were fabricated using thermal shunt and bathtub thermal management techniques. Broadband cascode MMICs exhibited 10 - 14 dB gain at an output power of 2.5 - 3.0 Watts across 7 - 11 GHz. A 200 {mu}m{sup 2} common-emitter unit cell achieved 7 - 8 dB linear power gain and 40% power-added efficiency at a noise power ratio (NPR) of 18 dBc at 12 GHz. Under single tone measurements at 12 GHz, the unit cell achieved 52% power-added efficiency, with 9.5 dB linear gain, 8 dB power gain and 240 mW output power at 5 V bias.

  7. Development of gallium nitride-based PNP heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Green, Daniel S.

    GaN-based electronics have progressed mightily in the last 15 years. The primary focus of this development has been the AlGaN/GaN heterostructure FET, with the commercialization of this device in progress. Bipolar transistors however offer a few key potential advantages over the FET device, including the primary advantage of normally off operation. Additionally, the pnp heterostructure bipolar transistor (HBT) in particular offers more attractive base performance relative to the npn HBT. The pnp HBT also serves as an excellent test vehicle for the several material parameters of p-Gan that remain poor defined. However, implementation of the pnp HBT has been limited by the difficulty contacting p-GaN collector material. This work was designed to demonstrate and understand the pnp HBT. The research served as both an engineering challenge as well as an investigation of physical parameters governing the transport in the device. In order to remedy the poor collector contact available with buried p-GaN, a transformation diode HBT structure was introduced that added an n-type subcollector the HBT structure. This allowed for good collector contact at the cost of introducing an offset voltage to the HBT performance due to the turn-on voltage of the transformation diode under normal operation. The first transformation diode HBT in GaN was successful demonstrated. In order to improve the transformation diode performance, successive design iterations were performed to isolate the performance limiting elements. Device designs were implemented to mitigate saturated hole velocity, as well as to decrease base transit time through aggressive base scaling and compositional grading. Physical simulations and modelling of device non-idealities were used to understand actual device performance. Hole lifetime and saturated hole velocity were identified as primary contributors to lower than expected performance device performance. Successive device iterations yielded HBT performance of

  8. Understanding the failure mechanisms of microwave bipolar transistors caused by electrostatic discharge

    NASA Astrophysics Data System (ADS)

    Jin, Liu; Yongguang, Chen; Zhiliang, Tan; Jie, Yang; Xijun, Zhang; Zhenxing, Wang

    2011-10-01

    Electrostatic discharge (ESD) phenomena involve both electrical and thermal effects, and a direct electrostatic discharge to an electronic device is one of the most severe threats to component reliability. Therefore, the electrical and thermal stability of multifinger microwave bipolar transistors (BJTs) under ESD conditions has been investigated theoretically and experimentally. 100 samples have been tested for multiple pulses until a failure occurred. Meanwhile, the distributions of electric field, current density and lattice temperature have also been analyzed by use of the two-dimensional device simulation tool Medici. There is a good agreement between the simulated results and failure analysis. In the case of a thermal couple, the avalanche current distribution in the fingers is in general spatially unstable and results in the formation of current crowding effects and crystal defects. The experimental results indicate that a collector-base junction is more sensitive to ESD than an emitter-base junction based on the special device structure. When the ESD level increased to 1.3 kV, the collector-base junction has been burnt out first. The analysis has also demonstrated that ESD failures occur generally by upsetting the breakdown voltage of the dielectric or overheating of the aluminum-silicon eutectic. In addition, fatigue phenomena are observed during ESD testing, with devices that still function after repeated low-intensity ESDs but whose performances have been severely degraded.

  9. Neutron effects on the electrical and switching characteristics of NPN bipolar power transistors

    NASA Technical Reports Server (NTRS)

    Frasca, Albert J.; Schwarze, Gene E.

    1988-01-01

    The use of nuclear reactors to generate electrical power for future space missions will require the electrical components used in the power conditioning, control, and transmission subsystem to operate in the associated radiation environments. An initial assessment of neutron irradiation on the electrical and switching characteristics of commercial high power NPN bipolar transistors was investigated. The results clearly show the detrimental effects caused by neutron irradiation on the electrical and switching characteristics of the NPN bipolar power transistor.

  10. Long-Term Reliability of High Speed SiGe/Si Heterojunction Bipolar Transistors

    NASA Technical Reports Server (NTRS)

    Ponchak, George E. (Technical Monitor); Bhattacharya, Pallab

    2003-01-01

    Accelerated lifetime tests were performed on double-mesa structure Si/Si0.7Ge0.3/Si npn heterojunction bipolar transistors, grown by molecular beam epitaxy, in the temperature range of 175C-275C. Both single- and multiple finger transistors were tested. The single-finger transistors (with 5x20 micron sq m emitter area) have DC current gains approximately 40-50 and f(sub T) and f(sub MAX) of up to 22 GHz and 25 GHz, respectively. The multiple finger transistors (1.4 micron finger width, 9 emitter fingers with total emitter area of 403 micron sq m) have similar DC current gain but f(sub T) of 50 GHz. It is found that a gradual degradation in these devices is caused by the recombination enhanced impurity diffusion (REID) of boron atoms from the p-type base region and the associated formation of parasitic energy barriers to electron transport from the emitter to collector layers. This REID has been quantitatively modeled and explained, to the first order of approximation, and the agreement with the measured data is good. The mean time to failure (MTTF) of the devices at room temperature is estimated from the extrapolation of the Arrhenius plots of device lifetime versus reciprocal temperature. The results of the reliability tests offer valuable feedback for SiGe heterostructure design in order to improve the long-term reliability of the devices and circuits made with them. Hot electron induced degradation of the base-emitter junction was also observed during the accelerated lifetime testing. In order to improve the HBT reliability endangered by the hot electrons, deuterium sintered techniques have been proposed. The preliminary results from this study show that a deuterium-sintered HBT is, indeed, more resistant to hot-electron induced base-emitter junction degradation. SiGe/Si based amplifier circuits were also subjected to lifetime testing and we extrapolate MTTF is approximately 1.1_10(exp 6) hours at 125iC junction temperature from the circuit lifetime data.

  11. Degradation of InGaAs/InP double heterojunction bipolar transistors under electron irradiation

    SciTech Connect

    Bandyopadhyay, A.; Subramanian, S.; Chandrasekhar, S.; Dentai, A.G.; Goodnick, S.M.

    1999-05-01

    The dc characteristics of InGaAs/InP double heterojunction bipolar transistors (DHBT`s) are studied under high-energy ({approximately}1 MeV) electron irradiation up to a fluence of 14.8 {times} 10{sup 15} electrons/cm{sup 2}. The devices show an increase in common-emitter current gain (h{sub fe}) at low levels of dose (<10{sup 15} electrons/cm{sup 2}) and a gradual decrease in h{sub fe} and an increase in output conductance for higher doses. The decrease in h{sub fe} is as much as {approximately}80% at low base currents ({approximately}10 {micro}A) after a cumulative dose of 14.8 {times} 10{sup 15} electrons/cm{sup 2}. The observed degradation effects in collector current-voltage (I-V) characteristics are studied quantitatively using a simple SPICE-like device model. The overall decrease in h{sub fe} is attributed to increased recombination in the emitter-base junction region caused by radiation-induced defects. The defects introduced in the collector-base junction region are believed to be responsible for the observed increase in the output conductance.

  12. Radiation effects in III-V semiconductors and heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Shatalov, Alexei

    The electron, gamma and neutron radiation degradation of III-V semiconductors and heterojunction bipolar transistors (HBTs) is investigated in this thesis. Particular attention is paid to InP and InGaAs materials and InP/InGaAs abrupt single HBTs (SHBTs). Complete process sequences for fabrication of InP/ InGaAs HBTs are developed and subsequently employed to produce the devices, which are then electrically characterized and irradiated with the different types of radiation. A comprehensive analytical HBT model is developed and radiation damage calculations are performed to model the observed radiation-induced degradation of SHBTs. The most pronounced radiation effects found in SHBTs include reduction of the common-emitter DC current gain, shift of the collector-emitter (CE) offset voltage and increase of the emitter, base and collector parasitic resistances. Quantitative analysis performed using the developed model demonstrates that increase of the neutral bulk and base-emitter (BE) space charge region (SCR) components of the base current are responsible for the observed current gain degradation. The rise of the neutral bulk recombination is attributed to decrease in a Shockley-Read-Hall (SRH) carrier lifetime, while the SCR current increase is caused by rising SCR SRH recombination and activation of a tunneling-recombination mechanism. On the material level these effects are explained by displacement defects produced in a semiconductor by the incident radiation. The second primary change of the SHBT characteristics, CE offset voltage shift, is induced by degradation of the base- collector (BC) junction. The observed rise of the BC current is brought on by diffusion and recombination currents which increase as more defects are introduced in a semiconductor. Finally, the resistance degradation is attributed to deterioration of low-doped layers of a transistor, and to degradation of the device metal contacts.

  13. InGaP/InGaAsN/GaAs NpN double-heterojunction bipolar transistor

    SciTech Connect

    Chang, P. C.; Baca, A. G.; Li, N. Y.; Xie, X. M.; Hou, H. Q.; Armour, E.

    2000-04-17

    We have demonstrated a functional NpN double-heterojunction bipolar transistor (DHBT) using InGaAsN for the base layer. The InGaP/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}/GaAs DHBT has a low V{sub ON} of 0.81 V, which is 0.13 V lower than in a InGaP/GaAs heterojunction bipolar transistor (HBT). The lower turn-on voltage is attributed to the smaller band gap (1.20 eV) of metalorganic chemical vapor deposition-grown In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} base layer. GaAs is used for the collector; thus the breakdown voltage (BV{sub CEO}) is 10 V, consistent with the BV{sub CEO} of InGaP/GaAs HBTs of comparable collector thickness and doping level. To alleviate the current blocking phenomenon caused by the larger conduction band discontinuity between InGaAsN and GaAs, a graded InGaAs layer with {delta} doping is inserted at the base-collector junction. The improved device has a peak current gain of seven with ideal current-voltage characteristics. (c) 2000 American Institute of Physics.

  14. Lateral carrier diffusion and current gain in terahertz InGaAs/InP double-heterojunction bipolar transistors

    SciTech Connect

    Chiang, Han-Wei; Rode, Johann C.; Choudhary, Prateek; Rodwell, Mark J. W.

    2014-01-21

    The DC current gain in In{sub 0.53}Ga{sub 0.47}As/InP double-heterojunction bipolar transistors is computed based on a drift-diffusion model, and is compared with experimental data. Even in the absence of other scaling effects, lateral diffusion of electrons to the base Ohmic contacts causes a rapid reduction in DC current gain as the emitter junction width and emitter-base contact spacing are reduced. The simulation and experimental data are compared in order to examine the effect of carrier lateral diffusion on current gain. The impact on current gain due to device scaling and approaches to increase current gain are discussed.

  15. Epitaxially-Grown GaN Junction Field Effect Transistors

    SciTech Connect

    Baca, A.G.; Chang, P.C.; Denbaars, S.P.; Lester, L.F.; Mishra, U.K.; Shul, R.J.; Willison, C.G.; Zhang, L.; Zolper, J.C.

    1999-05-19

    Junction field effect transistors (JFET) are fabricated on a GaN epitaxial structure grown by metal organic chemical vapor deposition (MOCVD). The DC and microwave characteristics of the device are presented. A junction breakdown voltage of 56 V is obtained corresponding to the theoretical limit of the breakdown field in GaN for the doping levels used. A maximum extrinsic transconductance (gm) of 48 mS/mm and a maximum source-drain current of 270 mA/mm are achieved on a 0.8 µ m gate JFET device at VGS= 1 V and VDS=15 V. The intrinsic transconductance, calculated from the measured gm and the source series resistance, is 81 mS/mm. The fT and fmax for these devices are 6 GHz and 12 GHz, respectively. These JFETs exhibit a significant current reduction after a high drain bias is applied, which is attributed to a partially depleted channel caused by trapped hot-electrons in the semi-insulating GaN buffer layer. A theoretical model describing the current collapse is described, and an estimate for the length of the trapped electron region is given.

  16. Lateral PNP bipolar transistor with aiding field diffusions

    NASA Technical Reports Server (NTRS)

    Gallagher, R. C.; Mc Cann, D. H.

    1969-01-01

    Fabrication technique produces field aided lateral PNP transistors compatible with micropower switching circuits. The sub-collector diffusion is performed with phosphorus as the dopant and the epitaxy is grown using the higher temperature silicon tetrachloride process.

  17. Transferred substrate heterojunction bipolar transistors for submillimeter wave applications

    NASA Technical Reports Server (NTRS)

    Fung, A.; Samoska, L.; Siegel, P.; Rodwell, M.; Urteaga, M.; Paidi, V.

    2003-01-01

    We present ongoing work towards the development of submillimeter wave transistors with goals of realizing advanced high frequency amplifiers, voltage controlled oscillators, active multipliers, and traditional high-speed digital circuits.

  18. Analysis of collector-emitter offset voltage of InGaP/GaAs composite collector double heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Lew, K. L.; Yoon, S. F.

    2002-04-01

    The Ebers-Moll-like terminal current expressions of a composite collector double heterojunction bipolar transistor (DHBT), which takes the recombination effect into account, have been formulated and an expression for collector-emitter offset voltage [VCE(offset)] has been derived. Factors affecting the VCE(offset) of a composite collector DHBT are investigated and good agreement between the calculated and reported experimental results is shown. Analytical results showed that the transmission coefficient of the base-collector (B-C) junction does not have a considerable effect on the VCE(offset), provided that the B-C junction is of good quality. Thus, despite its asymmetric structure, the VCE(offset) of an optimally designed composite collector DHBT could be as low as that of a conventional DHBT. Hence a composite collector DHBT with low saturation voltage and negligible VCE(offset) is possible if the two conditions: (i) good quality B-C junction, (ii) base transport factor, α≈1, are fulfilled.

  19. A single epitaxial structure for the integration of lasers with heterostructure bipolar transistors

    NASA Astrophysics Data System (ADS)

    Goyal, Anish Kumar

    This dissertation introduces a new method of monolithically integrating lasers and heterostructure bipolar transistors (HBTs). This method relies on placing the gain medium for lasers in the collector layer of an (Al,Ga)As HBT epitaxial structure. The trade-offs between laser and HBT performance which are associated with such an integration method are discussed in detail. Two designs based on this method were evaluated experimentally. In the first design, an Npn, emitter-up HBT epitaxial structure was modified to incorporated three Insb{0.2}Gasb{0.8}As QWs in the collector layer which serve as the optical gain media for lasers. 13 x 13 μmsp2 HBTs fabricated from this epi-material exhibited common emitter current gains >50 while 6×20\\ μmsp2 HBTs exhibited an fsb{t}=21 GHz and fsb{max}=6.8 GHz. The DC and high frequency characteristics of HBTs are consistent with their size, layer thicknesses, layer dopings, etc. Metal-clad lasers were also fabricated from this epi-material. For these lasers, a silver film deposited directly on the base served as both the upper optical cladding layer and p-electrode. Lasers exhibit pulsed threshold current densities as low as 440 A/cmsp2. The measured waveguide propagation loss of these metal-clad lasers is in excellent agreement with theory. The second design was based on a Pnp, collector-up HBT epitaxial structure. For HBTs, the extrinsic portion of the EB junction was not deactivated and resulted in HBTs with less than unity current gain. 6.5 mum stripe width, ridge waveguide lasers fabricated from this same material exhibited threshold current densities of ˜1300 A/cmsp2. This is approximately what is expected from the epitaxial layer design and device structure. Furthermore, the measured waveguide propagation loss of 14 cmsp{-1} is close to the anticipated value of 11.2 cmsp{-1}.

  20. Ion-implanted GaN junction field effect transistor

    SciTech Connect

    Zolper, J.C.; Shul, R.J.; Baca, A.G.; Wilson, R.G.; Pearton, S.J.; Stall, R.A.

    1996-04-01

    Selective area ion implantation doping has been used to fabricate GaN junction field effect transistors (JFETs). {ital p}-type and {ital n}-type doping was achieved with Ca and Si implantation, respectively, followed by a 1150{degree}C rapid thermal anneal. A refractory W gate contact was employed that allows the {ital p}-gate region to be self-aligned to the gate contact. A gate turn-on voltage of 1.84 V at 1 mA/mm of gate current was achieved. For a {approximately}1.7 {mu}m{times}50 {mu}m JFET with a {minus}6 V threshold voltage, a maximum transconductance of 7 mS/mm at {ital V}{sub GS}={minus} 2V and saturation current of 33 mA/mm at {ital V}{sub GS}=0 V were measured. These results were limited by excess access resistance and can be expected to be improved with optimized {ital n}{sup +} implants in the source and drain regions. {copyright} {ital 1996 American Institute of Physics.}

  1. Unified planar process for fabricating heterojunction bipolar transistors and buried-heterostructure lasers utilizing impurity-induced disordering

    SciTech Connect

    Thornton, R.L.; Mosby, W.J.; Chung, H.F.

    1988-12-26

    We describe results on a novel geometry of heterojunction bipolar transistor that has been realized by impurity-induced disordering. This structure is fabricated by a method that is compatible with techniques for the fabrication of low threshold current buried-heterostructure lasers. We have demonstrated this compatibility by fabricating a hybrid laser/transistor structure that operates as a laser with a threshold current of 6 mA at room temperature, and as a transistor with a current gain of 5.

  2. Unified planar process for fabricating heterojunction bipolar transistors and buried-heterostructure lasers utilizing impurity-induced disordering

    NASA Astrophysics Data System (ADS)

    Thornton, R. L.; Mosby, W. J.; Chung, H. F.

    1988-12-01

    We describe results on a novel geometry of heterojunction bipolar transistor that has been realized by impurity-induced disordering. This structure is fabricated by a method that is compatible with techniques for the fabrication of low threshold current buried-heterostructure lasers. We have demonstrated this compatibility by fabricating a hybrid laser/transistor structure that operates as a laser with a threshold current of 6 mA at room temperature, and as a transistor with a current gain of 5.

  3. Simulation of synergistic effects on lateral PNP bipolar transistors induced by neutron and gamma irradiation

    NASA Astrophysics Data System (ADS)

    Wang, Chenhui; Bai, Xiaoyan; Chen, Wei; Yang, Shanchao; Liu, Yan; Jin, Xiaoming; Ding, Lili

    2015-10-01

    With semiconductor device simulation software TCAD, numerical simulations of ionizing/displacement synergistic effects on 6 kinds of lateral PNP bipolar transistors induced by the mixed irradiation of neutron and gamma are carried out by means of changing the minority carrier lifetimes, adding charged traps to the oxide layer and increasing the surface recombination velocity in Si/SiO2 interface. The results indicate that ionizing/displacement synergistic effects on the lateral PNP bipolar transistors are not a simple sum of total ionizing dose effects and displacement effects, and total ionizing dose effects can enhance neutron displacement damages, leading to greater gain degradation. The physical mechanisms of ionizing/displacement synergistic effects are analyzed based on the results. The positive charge in the oxide layer and Si/SiO2 interface traps induced by gamma irradiation can enhance the recombination processes of carriers in the bulk defects induced by neutron irradiation, and this is the main cause of ionizing/displacement synergistic effects on the lateral PNP bipolar transistors.

  4. Three-terminal heterojunction bipolar transistor solar cell for high-efficiency photovoltaic conversion

    PubMed Central

    Martí, A.; Luque, A.

    2015-01-01

    Here we propose, for the first time, a solar cell characterized by a semiconductor transistor structure (n/p/n or p/n/p) where the base–emitter junction is made of a high-bandgap semiconductor and the collector is made of a low-bandgap semiconductor. We calculate its detailed-balance efficiency limit and prove that it is the same one than that of a double-junction solar cell. The practical importance of this result relies on the simplicity of the structure that reduces the number of layers that are required to match the limiting efficiency of dual-junction solar cells without using tunnel junctions. The device naturally emerges as a three-terminal solar cell and can also be used as building block of multijunction solar cells with an increased number of junctions. PMID:25902374

  5. Three-terminal heterojunction bipolar transistor solar cell for high-efficiency photovoltaic conversion.

    PubMed

    Martí, A; Luque, A

    2015-01-01

    Here we propose, for the first time, a solar cell characterized by a semiconductor transistor structure (n/p/n or p/n/p) where the base-emitter junction is made of a high-bandgap semiconductor and the collector is made of a low-bandgap semiconductor. We calculate its detailed-balance efficiency limit and prove that it is the same one than that of a double-junction solar cell. The practical importance of this result relies on the simplicity of the structure that reduces the number of layers that are required to match the limiting efficiency of dual-junction solar cells without using tunnel junctions. The device naturally emerges as a three-terminal solar cell and can also be used as building block of multijunction solar cells with an increased number of junctions. PMID:25902374

  6. An approximate HSPICE model for orbit low noise analog bipolar NPN transistors

    SciTech Connect

    Zimmerman, T.

    1991-07-01

    Vertical bipolar NPN transistors can be fabricated cheaply through MOSIS by using the Orbit 2 um Low Noise Analog CMOS process. The collector is formed from an N-well, the base from a p-base diffusion, and the emitter from an N-diffusion. However, since this is a CMOS process there is no buried layer in the collector. Therefore the collector resistance is quite large. Also, the minimum emitter size is 8 um {times} 8 um, which is substantially larger than many fast bipolar processes. For certain applications, though, such as common base or emitter follower amplifiers, the performance of this transistor may be quite acceptable. However, no AC SPICE model is published for this device. This paper describes a simple approximate measurement method that was used at Fermilab to formulate an HSPICE model for these transistor. This method requires only a fast pulse generator and a good digitizing oscilloscope with an active FET probe for the AC measurements. Model parameters for two transistors of different size are then given. 1 ref., 1 fig.

  7. Ballistic bipolar junctions in chemically gated graphene ribbons

    PubMed Central

    Baringhaus, Jens; Stöhr, Alexander; Forti, Stiven; Starke, Ulrich; Tegenkamp, Christoph

    2015-01-01

    The realization of ballistic graphene pn-junctions is an essential task in order to study Klein tunneling phenomena. Here we show that intercalation of Ge under the buffer layer of pre-structured SiC-samples succeeds to make truly nano-scaled pn-junctions. By means of local tunneling spectroscopy the junction width is found to be as narrow as 5 nm which is a hundred times smaller compared to electrically gated structures. The ballistic transmission across the junction is directly proven by systematic transport measurements with a 4-tip STM. Various npn- and pnp-junctions are studied with respect to the barrier length. The pn-junctions are shown to act as polarizer and analyzer with the second junction becoming transparent in case of a fully ballistic barrier. This can be attributed to the almost full suppression of electron transmission through the junction away from normal incidence. PMID:25898259

  8. Investigation and application of neutron damage to bipolar transistors in light water reactor dosimetry

    SciTech Connect

    Roknizadeh, M.

    1987-01-01

    A method of fast neutron metrology and a basis for prediction of changes in performance parameters of semiconductor devices in power plant radiation environments has been established using Cf-252 sources. Three general purpose NPN bipolar transistors (PN2222A, ECG-196, and ECG-184) were chosen as the neutron damage monitors and the change in inverse d.c. current gain before and after irradiation was chosen as the damage parameter for the measurement. The main findings of the investigation were as follows: the change in inverse d.c. current gain for PN2222A transistors was approximately a linear function of the neutron fluence up to 2.0E15 n(1MeV)/cm/sup 2/. The concept of 1-MeV equivalent neutron fluence which characterizes an incident energy-fluence spectrum in terms of the fluence of monoenergetic neutrons at 1 MeV, is in error for application to common transistors in a typical power plant environment. Finally, the normalized damage coefficient which is the ratio of damage to 1-MeV equivalent neutron fluence divided by the measured base transit time of individual transistors, for all three types of transistors is nearly the same with an average value of 1.27E - 7 +/- 15.0% cm/sup 2//m(1 MeV).Sec.

  9. Demonstration and properties of a planar heterojunction bipolar transistor with lateral current flow

    NASA Astrophysics Data System (ADS)

    Thornton, Robert L.; Mosby, William J.; Chung, Harlan F.

    1989-10-01

    The authors present fabrication techniques and device performance for a novel transistor structure, the lateral heterojunction bipolar transistor. The lateral heterojunctions are formed by impurity-induced disordering of a GaAs base layer sandwiched between two AlGaAs layers. These transistor structures exhibit current gains of 14 for base widths of 0.74 micron. Transistor action in this device occurs parallel to the surface of the device structure. The active base region of the structure is completely submerged, resulting in a reduction of surface recombination as a mechanism for gain reduction in the device. Impurity-induced disordering is used to widen the bandgap of the alloy in the emitter and collector, resulting in an improvement of the emitter injection efficiency. Since the device is based entirely on a surface diffusion process, the device is completely planar and has no steps involving etching of the III-V alloy material. These advantages lead this device to be considered as a candidate for optoelectronic integration applications. The transistor device functions as a buried heterostructure laser, with a threshold current as low as 6 mA for a 1.4-micron stripe.

  10. Two integral relations pertaining to the electron transport through a bipolar transistor with a nonuniform energy gap in the base region

    NASA Astrophysics Data System (ADS)

    Kroemer, H.

    1985-11-01

    The two integral relations by Moll and Ross for the current flow through the base region of a bipolar transistor, and for the base transit time, are generalized to the case of a heterostructure bipolar transistor with a nonuniform energy gap in the base region.

  11. Numerical analysis of distortion characteristics of heterojunction bipolar transistor laser

    NASA Astrophysics Data System (ADS)

    Piramasubramanian, S.; Ganesh Madhan, M.; Nagella, Jyothsna; Dhanapriya, G.

    2015-12-01

    Numerical analysis of harmonic and third order intermodulation distortion of transistor laser is presented in this paper. The three level rate equations are numerically solved to determine the modulation and distortion characteristics. DC and AC analysis on the device are carried out to determine its power-current and frequency response characteristics. Further, the effects of quantum well recombination time and electron capture time in the quantum well, on the modulation depth and distortion characteristics are examined. It is observed that the threshold current density of the device decreases with increasing electron lifetime, which coincides with earlier findings. Also, the magnitude of harmonic distortion and intermodulation products are found to reduce with increasing current density and with a reduction of spontaneous emission recombination lifetime. However, an increase of electron capture time improves the distortion performance. A maximum modulation depth of 18.42 dB is obtained for 50 ps spontaneous emission life time and 1 ps electron capture time, for 2.4 GHz frequency at a current density of 2Jth. A minimum second harmonic distortion magnitude of -66.8 dBc is predicted for 50 ps spontaneous emission life time and 1 ps electron capture time for 2.4 GHz frequency, at a current density of 7Jth. Similarly, a minimum third order intermodulation distortion of -83.93 dBc is obtained for 150 ps spontaneous emission life time and 5 ps electron capture time under similar biasing conditions.

  12. Efficient far-infrared thermal bremsstrahlung radiation from a heterojunction bipolar transistor

    SciTech Connect

    Chung, Pei-Kang; Yen, Shun-Tung

    2015-08-28

    We investigate the far-infrared thermal radiation properties of a heterojunction bipolar transistor. The device conveniently provides a high electric field for electrons to heat the lattice and the electron gas in a background with ions embedded. Because of very high effective temperature of the electron gas in the collector, the electron-ion bremsstrahlung makes efficient the thermal radiation in the far-infrared region. The transistor can yield a radiation power of 0.1 mW with the spectral region between 2 and 75 THz and a power conversion efficiency of 6 × 10{sup −4}. Such output contains a power of 20 μW in the low-frequency part (2–20 THz) of the spectrum.

  13. T-shaped emitter metal heterojunction bipolar transistors for submillimeter wave applications

    NASA Technical Reports Server (NTRS)

    Fung, Andy; Samoska, Lorene; Velebir, Jim; Siege, Peter; Rodwell, Mark; Paidi, Vamsi; Griffth, Zach; Urteaga, Miguel; Malik, Roger

    2004-01-01

    We report on the development of submillimeter wave transistors at JPL. The goal of the effort is to produce advance-reliable high frequency and high power amplifiers, voltage controlled oscillators, active multipliers, and high-speed mixed-signal circuits for space borne applications. The technology in development to achieve this is based on the Indium Phosphide (InP) Heterojunction Bipolar Transistor (HBT). The HBT is well suited for high speed, high power and uniform (across wafer) performance, due to the ability to tailor the material structure that electrons traverse through by well-controlled epitaxial growth methods. InP with its compatible lattice matched alloys such as indium gallium arsenide (InGaAs) and indium aluminium arsenide (InAlAs) provides for high electron velocities and high voltage breakdown capabilities. The epitaxial methods for this material system are fairly mature, however the implementation of high performance and reliable transistors are still under development by many laboratories. Our most recently fabricated, second generation mesa HBTs at JPL have extrapolated current gain cutoff frequency (FJ of 142GHz and power gain cutoff frequency (Fm,) of approximately 160GHz. This represents a 13% and 33% improvement of Ft and F, respectively, compared to the first generation mesa HBTs [l]. Analysis based on the University of California, Santa Barbara (UCSB) device model, RF device characteristics can be significantly improved by reducing base contact resistance and base metal contact width. We will describe our effort towards increasing transistor performance and yield.

  14. Cryogenic Preamplification of a Single-Electron-Transistor using a Silicon-Germanium Heterojunction-Bipolar-Transistor

    SciTech Connect

    Curry, Matthew J.; England, Troy Daniel; Bishop, Nathaniel; Ten Eyck, Gregory A.; Wendt, Joel R.; Pluym, Tammy; Lilly, Michael; Carr, Stephen M; Carroll, Malcolm S.

    2015-05-21

    We examine a silicon-germanium heterojunction bipolar transistor (HBT) for cryogenic pre-amplification of a single electron transistor (SET). The SET current modulates the base current of the HBT directly. The HBT-SET circuit is immersed in liquid helium, and its frequency response from low frequency to several MHz is measured. The current gain and the noise spectrum with the HBT result in a signal-to-noise-ratio (SNR) that is a factor of 10–100 larger than without the HBT at lower frequencies. Furthermore, the transition frequency defined by SNR = 1 has been extended by as much as a factor of 10 compared to without the HBT amplification. The power dissipated by the HBT cryogenic pre-amplifier is approximately 5 nW to 5 μW for the investigated range of operation. We found that the circuit is also operated in a single electron charge read-out configuration in the time-domain as a proof-of-principle demonstration of the amplification approach for single spin read-out.

  15. Cryogenic preamplification of a single-electron-transistor using a silicon-germanium heterojunction-bipolar-transistor

    NASA Astrophysics Data System (ADS)

    Curry, M. J.; England, T. D.; Bishop, N. C.; Ten-Eyck, G.; Wendt, J. R.; Pluym, T.; Lilly, M. P.; Carr, S. M.; Carroll, M. S.

    2015-05-01

    We examine a silicon-germanium heterojunction bipolar transistor (HBT) for cryogenic pre-amplification of a single electron transistor (SET). The SET current modulates the base current of the HBT directly. The HBT-SET circuit is immersed in liquid helium, and its frequency response from low frequency to several MHz is measured. The current gain and the noise spectrum with the HBT result in a signal-to-noise-ratio (SNR) that is a factor of 10-100 larger than without the HBT at lower frequencies. The transition frequency defined by SNR = 1 has been extended by as much as a factor of 10 compared to without the HBT amplification. The power dissipated by the HBT cryogenic pre-amplifier is approximately 5 nW to 5 μW for the investigated range of operation. The circuit is also operated in a single electron charge read-out configuration in the time-domain as a proof-of-principle demonstration of the amplification approach for single spin read-out.

  16. Cryogenic Preamplification of a Single-Electron-Transistor using a Silicon-Germanium Heterojunction-Bipolar-Transistor

    DOE PAGESBeta

    Curry, Matthew J.; England, Troy Daniel; Bishop, Nathaniel; Ten Eyck, Gregory A.; Wendt, Joel R.; Pluym, Tammy; Lilly, Michael; Carr, Stephen M; Carroll, Malcolm S.

    2015-05-21

    We examine a silicon-germanium heterojunction bipolar transistor (HBT) for cryogenic pre-amplification of a single electron transistor (SET). The SET current modulates the base current of the HBT directly. The HBT-SET circuit is immersed in liquid helium, and its frequency response from low frequency to several MHz is measured. The current gain and the noise spectrum with the HBT result in a signal-to-noise-ratio (SNR) that is a factor of 10–100 larger than without the HBT at lower frequencies. Furthermore, the transition frequency defined by SNR = 1 has been extended by as much as a factor of 10 compared to withoutmore » the HBT amplification. The power dissipated by the HBT cryogenic pre-amplifier is approximately 5 nW to 5 μW for the investigated range of operation. We found that the circuit is also operated in a single electron charge read-out configuration in the time-domain as a proof-of-principle demonstration of the amplification approach for single spin read-out.« less

  17. Cryogenic preamplification of a single-electron-transistor using a silicon-germanium heterojunction-bipolar-transistor

    SciTech Connect

    Curry, M. J.; England, T. D.; Bishop, N. C.; Ten-Eyck, G.; Wendt, J. R.; Pluym, T.; Lilly, M. P.; Carroll, M. S.; Carr, S. M.

    2015-05-18

    We examine a silicon-germanium heterojunction bipolar transistor (HBT) for cryogenic pre-amplification of a single electron transistor (SET). The SET current modulates the base current of the HBT directly. The HBT-SET circuit is immersed in liquid helium, and its frequency response from low frequency to several MHz is measured. The current gain and the noise spectrum with the HBT result in a signal-to-noise-ratio (SNR) that is a factor of 10–100 larger than without the HBT at lower frequencies. The transition frequency defined by SNR = 1 has been extended by as much as a factor of 10 compared to without the HBT amplification. The power dissipated by the HBT cryogenic pre-amplifier is approximately 5 nW to 5 μW for the investigated range of operation. The circuit is also operated in a single electron charge read-out configuration in the time-domain as a proof-of-principle demonstration of the amplification approach for single spin read-out.

  18. The total switch time of silicon bipolar transistors with base doping gradients or with germanium gradients in the base

    NASA Astrophysics Data System (ADS)

    Karlsteen, M.; Willander, M.

    1993-11-01

    In this paper the total switch time for a transistor in a Direct Coupled Transistor Logic (DCTL) circuit is simulated by using Laplace transformations of the Ebers-Moll equations. The influence of doping gradients and germanium gradients in the base is investigated and their relative importance and their limitations are established. In a well designed bipolar transistor only a minor enhancement of the total switch time is obtained with the use of a doping gradient in the base. However, for bipolar transistors with base thickness over 500 Å, an improperly selected doping profile could be devastating for the total switch time. For a bipolar transistor the improvement of the total switch time due to a linear germanium gradient in the base could be up to about 30% compared with an ordinary silicon bipolar transistor. Still, a too high germanium gradient forces the normal transistor current gain (α N) to grow and the total switch time is thereby increased. Further enhancement could be achieved by the use of a second degree polynomial germanium profile in the base. Also in this case, care must be taken not to enlarge the germanium gradient too much as the total switch time then starts to increase. In all cases the betterment of the base transit time that is introduced by the electric field will not be directly used to reduce the base transit time. Instead the improvement is mostly used to lower the emitter transition charging time. However, the most important parameter to control is the normal transistor current gain (α N) that has to be kept within a narrow range to keep the total switch time low.

  19. InGaP/InGaAsN/GaAs NpN double heterojunction bipolar transistor

    SciTech Connect

    Chang, P.C.; Baca, A.G.; Li, N.Y.; Xie, X.M.; Sharps, P.R.; Hou, H.Q.

    2000-01-10

    The authors have demonstrated a functional NpN double heterojunction bipolar transistor (DHBT) using InGaAsN for base layer. The InGaP/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}/GaAs DHBT has a low V{sub ON} of 0.81 V, which is 0.13 V lower than in a InGaP/GaAs HBT. The lower V{sub ON} is attributed to the smaller bandgap (E{sub g}=1.20eV) of MOCVD grown In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} base layer. GaAs is used for the collector; thus the BV{sub CEO} is 10 V, consistent with the BV{sub CEO} of InGaP/GaAs Hbts of comparable collector thickness and doping level. To alleviate the current blocking phenomenon caused by the larger {triangle}E{sub C} between InGaAsN and GaAs, a graded InGaAs layer with {delta}-doping is inserted at the base-collector junction. The improved device has a peak current gain of 7 with ideal IV characteristics.

  20. Trends in the emitter-base bias dependence of the average base transit time through abrupt heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Kumar, T.; Cahay, M.; Roenker, K.

    1996-11-01

    The average base transit time is computed using a current impulse response technique for three typical abrupt Npn heterojunction bipolar transistors as a function of the emitter-base bias, VBE. This technique is based on a hybrid model of carrier transport incorporating a quantum-mechanical analysis of carrier injection at the emitter-base junction and a Monte Carlo analysis of base transport. For typical AlGaAs/GaAs and InP/InGaAs structures, the base transit time first increases with VBE, reaches a maximum, and then decreases towards a value close to the one predicted using a semi-Maxwellian injection of carriers into the base at an energy equal to the emitter-base conduction band spike. For a typical InAlAs/InGaAs structure, the average base transit time is found to decrease with an increase in VBE. For all structures, we show that there is a correlation between the bias dependence of the average base transit time and the bias dependence of the average number of collisions per carrier (calculated for carriers transmitted across the base).

  1. High-speed electro-thermal modelling of a three-phase insulated gate bipolar transistor inverter power module

    NASA Astrophysics Data System (ADS)

    Zhou, Zhongfu; Igic, Petar

    2010-02-01

    In this article, a high-speed electro-thermal (ET) modelling strategy to predict the junction temperature of insulated gate bipolar transistor (IGBT) devices of a three-phase inverter power module is presented. The temperature-dependent power loss characteristics of IGBT and diode devices are measured and stored in lookup tables, which replace the conventional complicated physics-based compact models. An inverter is modelled as a voltage controlled voltage source, which allows the inverter-based power train simulation to be carried out in the continuous time domain with a large simulation time-step (1 ms). Using the simulated sinusoidal voltage and current components of the inverter output, the given pulse width modulation mode, the conduction time (duty ratio) and the current of the devices are extracted. Based on the lookup tables, on-times and conduction currents of devices, the average power loss over each simulation time-step is calculated, which is then fed into the inverter thermal model to predict the devices' temperatures. The advantage of the proposed model is that an accurate ET simulation of inverter for long real-time (many minutes) operation can be carried out within an acceptable computational time using a standard modern personal computer. Both simulation and experimental validation have been carried out, and an excellent agreement has been achieved between the simulation and experimental data.

  2. Effect of doping and stoichiometric profile on transport in SiGe heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Halilov, S.

    2016-09-01

    Based on analytical consideration and numerical simulations, it is shown how the mutually adjusted doping and stoichiometric profile results in improved frequency response and current gain in Si1‑x Ge x -based heterojunction bipolar transistor. The closed-form expressions are derived for the dopant distribution within a certain mobility model which is parametrized in terms of the impurity concentration and stoichiometric grading on the same footing. With proper parametrization of the mobility, the method is suitable in both limits of high alloy scattering/low crystal ordering and low alloy scattering/highly ordered stoichiometrically graded structure. The work is corroborated by device simulations of a single-side HBT 30% stoichiometrically graded base, with detailed IV-curve, Gummel and AC analysis. It is shown that the distinct impurity distribution results in a reduced space-charge region, contributes to an effective electric field assisting the diffusion of the minority carriers and results in the saturation current density increased by 50%, the AC gain increased by 90%, the four-fold increase of the DC current gain, and improves the transition frequency from 274 to 358 GHz as compared to the case of the uniformly distributed acceptors. The obtained results may serve as a practical guide in design of highly-graded heterojunction bipolar transistors with efficient frequency response, high gain and enhanced power.

  3. Fabrication and high temperature characteristics of ion-implanted GaAs bipolar transistors and ring-oscillators

    NASA Technical Reports Server (NTRS)

    Doerbeck, F. H.; Yuan, H. T.; Mclevige, W. V.

    1981-01-01

    Ion implantation techniques that permit the reproducible fabrication of bipolar GaAs integrated circuits are studied. A 15 stage ring oscillator and discrete transistor were characterized between 25 and 400 C. The current gain of the transistor was found to increase slightly with temperature. The diode leakage currents increase with an activation energy of approximately 1 eV and dominate the transistor leakage current 1 sub CEO above 200 C. Present devices fail catastrophically at about 400 C because of Au-metallization.

  4. Negative differential transconductance in silicon quantum well metal-oxide-semiconductor field effect/bipolar hybrid transistors

    SciTech Connect

    Naquin, Clint; Lee, Mark; Edwards, Hal; Mathur, Guru; Chatterjee, Tathagata; Maggio, Ken

    2014-11-24

    Introducing explicit quantum transport into Si transistors in a manner amenable to industrial fabrication has proven challenging. Hybrid field-effect/bipolar Si transistors fabricated on an industrial 45 nm process line are shown to demonstrate explicit quantum transport signatures. These transistors incorporate a lateral ion implantation-defined quantum well (QW) whose potential depth is controlled by a gate voltage (V{sub G}). Quantum transport in the form of negative differential transconductance (NDTC) is observed to temperatures >200 K. The NDTC is tied to a non-monotonic dependence of bipolar current gain on V{sub G} that reduces drain-source current through the QW. These devices establish the feasibility of exploiting quantum transport to transform the performance horizons of Si devices fabricated in an industrially scalable manner.

  5. InGaAs/InP heterojunction bipolar transistors for ultra-low power circuit applications

    SciTech Connect

    Chang, P.C.; Baca, A.G.; Hafich, M.J.; Ashby, C.I.

    1998-08-01

    For many modern day portable electronic applications, low power high speed devices have become very desirable. Very high values of f{sub T} and f{sub MAX} have been reported with InGaAs/InP heterojunction bipolar transistors (HBTs), but only under high bias and high current level operating conditions. An InGaAs/InP ultra-lowpower HBT with f{sub MAX} greater than 10 GHz operating at less than 20 {micro}A has been reported for the first time in this work. The results are obtained on a 2.5 x 5 {micro}m{sup 2} device, corresponding to less than 150 A/cm{sup 2} of current density. These are the lowest current levels at which f{sub MAX} {ge} 10 GHz has been reported.

  6. Microwave characterization and modeling of GaAs/AlGaAs heterojunction bipolar transistors

    NASA Technical Reports Server (NTRS)

    Simons, Rainee N.; Romanofsky, Robert R.

    1987-01-01

    The characterization and modeling of a microwave GaAs/AlGaAs heterojunction Bipolar Transistor (HBT) are discussed. The de-embedded scattering parameters are used to derive a small signal lumped element equivalent circuit model using EEsof's Touchstone software package. Each element in the equivalent circuit model is shown to have its origin within the device. The model shows good agreement between the measured and modeled scattering parameters over a wide range of bias currents. Further, the MAG (maximum available power gain) and the h sub 21 (current gain) calculated from the measured data and those predicted by the model are also in good agreement. Consequently, the model should also be capable of predicting the f sub max and the f sub T of other HBTs.

  7. Growth and Fabrication of GaN/AlGaN Heterojunction Bipolar Transistor

    SciTech Connect

    Abernathy, C.R.; Baca, A.G.; Cao, X.A.; Cho, H.; Dang, G.T.; Donovan, S.M.; Han, J.; Jung, K.B.; Pearton, S.J.; Ren, F.; Shul, R.J.; Willison, C.G.; Wilson, R.G.; Zhang, A.P.; Zhang, L

    1999-03-16

    A GaN/AlGaN heterojunction bipolar transistor structure with Mg doping in the base and Si Doping in the emitter and collector regions was grown by Metal Organic Chemical Vapor Deposition in c-axis Al(2)O(3). Secondary Ion Mass Spectrometry measurements showed no increase in the O concentration (2-3x10(18) cm(-3)) in the AlGaN emitter and fairly low levels of C (~4-5x10(17) cm (-3)) throughout the structure. Due to the non-ohmic behavior of the base contact at room temperature, the current gain of large area (~90 um diameter) devices was <3. Increasing the device operating temperature led to higher ionization fractions of the mg acceptors in the base, and current gains of ~10 were obtained at 300 degree C.

  8. InP Double Heterojunction Bipolar Transistor for broadband terahertz detection and imaging systems

    NASA Astrophysics Data System (ADS)

    Coquillat, D.; Nodjiadjim, V.; Konczykowska, A.; Dyakonova, N.; Consejo, C.; Ruffenach, S.; Teppe, F.; Riet, M.; Muraviev, A.; Gutin, A.; Shur, M.; Godin, J.; Knap, W.

    2015-10-01

    This paper presents terahertz detectors based on high performance 0.7-μm InP double heterojunction bipolar transistor (DHBT) technology and reports on the analysis of their voltage responsivity over a wide frequency range of the incoming terahertz radiation. The detectors operated without any spatial antennas to couple terahertz radiation to the device and have been characterized in the 0.25 - 3.1 THz range with the responsivities (normalized to 1 W radiant power) of 5 V/W and 200 μV/W measured at 0.35 THz and 3.11 THz, respectively. The InP DHBTs also performed as the imaging single-pixels at room temperature in the raster scanned transmission mode. A set of the sub-terahertz images of plant leaves suggest potential utility of InP DHBT detectors for terahertz imaging dedicated to non-invasive testing of plants.

  9. Investigation of proton irradiation effects on InP/InGaAs double heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Liu, Min; Zhang, Yuming; Lu, Hongliang; Zhang, Yimen; Zhang, Jincan; Ren, Xiaotang

    2015-07-01

    In this article, 3 MeV proton irradiation-induced degradation in InP/InGaAs double heterojunction bipolar transistors (DHBTs) is studied, the fluence up to 5 × 1012 protons/cm2, meanwhile 10 MeV proton irradiation is investigated in order to compare the differences induced by different proton energy irradiation. The devices exhibit good tolerance up to 5 × 1011 protons/cm2. The concentration of vacancies at different proton fluences can be calculated from SRIM. Being donor-like defects, the In and Ga vacancies act as compensation center while As vacancy acts as an acceptor-like defect. Adding the vacancies model into Sentaurus device simulator, simulation results match well with the trends of measured data.

  10. Design considerations of a MOS-bipolar Darlington structure: The vertical insulated base transistor (IBT)

    NASA Astrophysics Data System (ADS)

    Godignon, P.; Fernández, J.; Flores, D.; Hidalgo, S.; Rebollo, J.; Millán, J.; Chante, J. P.

    1996-12-01

    The analysis of a vertical insulated base transistor (MOS-bipolar Darlington power device with cellular layout) is discussed. The device operation is investigated in the framework of a schematic representation of the output characteristics and by means of 2D numerical simulation. A new design using a P --diffusion interconnecting the P-type regions is proposed to improve the device breakdown voltage. Several cellular and stripe geometries were implemented with a double metal layer technology. Experiments corroborate the simulation results pointing out that the IBT shows a low on-resistance and fast switching times. For the sake of comparison of their electrical characteristics VDMOS and IGBTs were also fabricated with the same process.

  11. A high-conductivity insulated gate bipolar transistor with Schottky hole barrier contact

    NASA Astrophysics Data System (ADS)

    Mengxuan, Jiang; John, Shen Z.; Jun, Wang; Xin, Yin; Zhikang, Shuai; Jiang, Lu

    2016-02-01

    This letter proposes a high-conductivity insulated gate bipolar transistor (HC-IGBT) with Schottky contact formed on the p-base, which forms a hole barrier at the p-base side to enhance the conductivity modulation effect. TCAD simulation shows that the HC-IGBT provides a current density increase by 53% and turn-off losses decrease by 27% when compared to a conventional field-stop IGBT (FS-IGBT). Hence, the proposed IGBT exhibits superior electrical performance for high-efficiency power electronic systems. Project supported by the National High Technology Research and Development Program of China (No. 2014AA052601) and the National Natural Science Foundation of China (No. 51277060).

  12. SiGe:C Heterojunction Bipolar Transistors: From Materials Research to Chip Fabrication

    NASA Astrophysics Data System (ADS)

    Ruecker, H.; Heinemann, B.; Knoll, D.; Ehwald, K.-E.

    Incorporation of substitutional carbon ( ~10^20 cm^-3) into the SiGe region of a heterojunction bipolar transistor (HBT) strongly reduces boron diffusion during device processing. We describe the physical mechanism behind the suppression of B diffusion in C-rich Si and SiGe, and explain how the increased thermal stability of doping profiles in SiGe:C HBTs can be used to improve device performance. Manufacturability of SiGe:C HBTs with transit frequencies of 100 GHz and maximum oscillation frequencies of 130 GHz is demonstrated in a BiCMOS technology capable of fabricating integrated circuits for radio frequencies with high yield.

  13. Arsenide-antimonide hetero-junction tunnel transistors for low power logic applications

    NASA Astrophysics Data System (ADS)

    Mohata, Dheeraj Kumar

    Aggressive supply voltage (VCC) scaling of future transistors without increasing the off-state leakage while maintaining performance remains an important challenge. Hetero-junction Tunnel FETs (HTFETs) with steep switching slope and high drive current at low supply voltage (below 0.35V) have emerged as promising low VCC device option. GaAs1-ySby source and InxGa1-xAs channel form lattice matched arsenide-antimonide staggered hetero-junctions with compositionally tunable effective tunnel barrier height. Unlike homo-junction Tunnel FETs, the effective barrier height of staggered hetero-junctions can be made negligibly small while maintaining large band-gaps in the respective source, channel and drain regions, thus, enabling TFETs to achieve MOSFET like drive currents while maintaining higher on-off ratio. This dissertation focuses on experimental demonstration of mixed arsenide-antimonide hetero-junction TFETs with nano-pillar tunnel transistor architecture exhibiting MOSFET-like on-current and high on-off ratio for ultra-low power logic applications. Within this dissertation, using experimental demonstration and detailed modeling, following aspects of the n-channel hetero-junction Tunnel FETs will be discussed: a) Material selection and device design; b) Nano-pillar TFET process flow development; c) Hetero-junction TFET growth and materials characterization; and d) Hetero-junction TFET transport study. The dissertation concludes with benchmarking of the performance of arsenide-antimonide n-channel Tunnel FETs with those reported till date, and an address to the feasibility of arsenide-antimonide based complementary Tunnel FET logic for future ultra low power logic applications.

  14. Complementary GaAs junction-gated heterostructure field effect transistor technology

    SciTech Connect

    Baca, A.G.; Zolper, J.C.; Sherwin, M.E.; Robertson, P.J.; Shul, R.J.; Howard, A.J.; Rieger, D.J.; Klem, J.F.

    1994-09-01

    The first circuit results for a new GaAs complementary logic technology are presented. The technology allows for Independently optimizable p- and n- channel transistors with junction gates. Excellent loaded gate delays of 179 ps at 1.2 V and 319 ps at 0.8 V have been demonstrated at low power supply voltages. A power-delay product of 8.9 fJ was obtained at 0.8 V.

  15. Radiative recombination in GaN/InGaN heterojunction bipolar transistors

    SciTech Connect

    Kao, Tsung-Ting; Lee, Yi-Che; Kim, Hee-Jin; Ryou, Jae-Hyun; Kim, Jeomoh; Detchprohm, Theeradetch; Dupuis, Russell D.; Shen, Shyh-Chiang

    2015-12-14

    We report an electroluminescence (EL) study on npn GaN/InGaN heterojunction bipolar transistors (HBTs). Three radiative recombination paths are resolved in the HBTs, corresponding to the band-to-band transition (3.3 eV), conduction-band-to-acceptor-level transition (3.15 eV), and yellow luminescence (YL) with the emission peak at 2.2 eV. We further study possible light emission paths by operating the HBTs under different biasing conditions. The band-to-band and the conduction-band-to-acceptor-level transitions mostly arise from the intrinsic base region, while a defect-related YL band could likely originate from the quasi-neutral base region of a GaN/InGaN HBT. The I{sub B}-dependent EL intensities for these three recombination paths are discussed. The results also show the radiative emission under the forward-active transistor mode operation is more effective than that using a diode-based emitter due to the enhanced excess electron concentration in the base region as increasing the collector current increases.

  16. InAs/Si Hetero-Junction Nanotube Tunnel Transistors

    PubMed Central

    Hanna, Amir N.; Fahad, Hossain M.; Hussain, Muhammad M.

    2015-01-01

    Hetero-structure tunnel junctions in non-planar gate-all-around nanowire (GAA NW) tunnel FETs (TFETs) have shown significant enhancement in ‘ON’ state tunnel current over their all-silicon counterpart. Here we show the unique concept of nanotube TFET in a hetero-structure configuration that is capable of much higher drive current as opposed to that of GAA NW TFETs.Through the use of inner/outer core-shell gates, a single III-V hetero-structured nanotube TFET leverages physically larger tunneling area while achieving higher driver current (ION) and saving real estates by eliminating arraying requirement. Numerical simulations has shown that a 10 nm thin nanotube TFET with a 100 nm core gate has a 5×normalized output current compared to a 10 nm diameter GAA NW TFET. PMID:25923104

  17. Design considerations for integration of Horizontal Current Bipolar Transistor (HCBT) with 0.18 μm bulk CMOS technology

    NASA Astrophysics Data System (ADS)

    Koričić, Marko; Suligoj, Tomislav; Mochizuki, Hidenori; Morita, So-ichi; Shinomura, Katsumi; Imai, Hisaya

    2010-10-01

    Design issues associated with integration of Horizontal Current Bipolar Transistor (HCBT) with 0.18 μm bulk CMOS process are examined and the effects of fabrication parameters on transistor performance analyzed. HCBT is fabricated on a sidewall of a silicon hill defined by shallow trench isolation (STI). Height of the transistor is limited by the STI depth of 350 nm. Impact of vertical and horizontal dimensions on electrical performance of the transistor are analyzed by simulations with emphasis on extrinsic base design. Base current is reduced by high extrinsic base concentration and increased link-base length. Current gain is increased from 16 to 67 for transistor processed with the optimized extrinsic base profile. High-frequency performance is degraded by the collector charge sharing effect and can be improved by the larger separation between the extrinsic base and emitter, which is achieved with a small thickness of emitter polysilicon region. Misalignment tolerances of the extrinsic base implantation mask show no great impact on transistor's AC performance.

  18. Fabrication of Tunnel Junctions For Direct Detector Arrays With Single-Electron Transistor Readout Using Electron-Beam Lithography

    NASA Technical Reports Server (NTRS)

    Stevenson, T. R.; Hsieh, W.-T.; Li, M. J.; Stahle, C. M.; Rhee, K. W.; Teufel, J.; Schoelkopf, R. J.

    2002-01-01

    This paper will describe the fabrication of small aluminum tunnel junctions for applications in astronomy. Antenna-coupled superconducting tunnel junctions with integrated single-electron transistor readout have the potential for photon-counting sensitivity at sub-millimeter wavelengths. The junctions for the detector and single-electron transistor can be made with electron-beam lithography and a standard self-aligned double-angle deposition process. However, high yield and uniformity of the junctions is required for large-format detector arrays. This paper will describe how measurement and modification of the sensitivity ratio in the resist bilayer was used to greatly improve the reliability of forming devices with uniform, sub-micron size, low-leakage junctions.

  19. InGaAsN/AlGaAs Pnp Heterojunction Bipolar Transistor

    SciTech Connect

    BACA,ALBERT G.; CHANG,PING-CHIH; HOU,H.Q.; LAROCHE,J.R.; LI,N.Y.; REN,F.; SHARPS,P.R.

    1999-11-03

    The authors have demonstrated a functional Pnp heterojunction bipolar transistor (HBT) using InGaAsN. The metalorganic vapor phase epitaxy (MOCVD) grown Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} HBT takes advantage of the narrower bandgap energy (E{sub g} = 1.25eV) of In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}, which is lattice matched to GaAs. Compared with the Al{sub 0.3}Ga{sub 0.7}As/GaAs material system, the Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} material system has a larger conduction band offset, while the valence band offset remains comparable. This characteristic band alignment is very suitable for Pnp HBT applications. The device's peak current gain is 23 and it has a turn on voltage of 0.77V, which is 0.25V lower than in a comparable Pnp Al{sub 0.3}Ga{sub 0.7}As/GaAs HBT.

  20. Heat Removal from Bipolar Transistor by Loop Heat Pipe with Nickel and Copper Porous Structures

    PubMed Central

    Smitka, Martin; Malcho, Milan

    2014-01-01

    Loop heat pipes (LHPs) are used in many branches of industry, mainly for cooling of electrical elements and systems. The loop heat pipe is a vapour-liquid phase-change device that transfers heat from evaporator to condenser. One of the most important parts of the LHP is the porous wick structure. The wick structure provides capillary force to circulate the working fluid. To achieve good thermal performance of LHP, capillary wicks with high permeability and porosity and fine pore radius are expected. The aim of this work was to develop porous structures from copper and nickel powder with different grain sizes. For experiment copper powder with grain size of 50 and 100 μm and nickel powder with grain size of 10 and 25 μm were used. Analysis of these porous structures and LHP design are described in the paper. And the measurements' influences of porous structures in LHP on heat removal from the insulated gate bipolar transistor (IGBT) have been made. PMID:24959622

  1. Heat removal from bipolar transistor by loop heat pipe with nickel and copper porous structures.

    PubMed

    Nemec, Patrik; Smitka, Martin; Malcho, Milan

    2014-01-01

    Loop heat pipes (LHPs) are used in many branches of industry, mainly for cooling of electrical elements and systems. The loop heat pipe is a vapour-liquid phase-change device that transfers heat from evaporator to condenser. One of the most important parts of the LHP is the porous wick structure. The wick structure provides capillary force to circulate the working fluid. To achieve good thermal performance of LHP, capillary wicks with high permeability and porosity and fine pore radius are expected. The aim of this work was to develop porous structures from copper and nickel powder with different grain sizes. For experiment copper powder with grain size of 50 and 100 μm and nickel powder with grain size of 10 and 25 μm were used. Analysis of these porous structures and LHP design are described in the paper. And the measurements' influences of porous structures in LHP on heat removal from the insulated gate bipolar transistor (IGBT) have been made. PMID:24959622

  2. Solution-processible organic-inorganic hybrid bipolar field-effect transistors

    NASA Astrophysics Data System (ADS)

    Chae, Gil Jo; Kim, Kang Dae; Cho, Shinuk; Walker, Bright; Seo, Jung Hwa

    2016-04-01

    Organic-inorganic hybrid bipolar field-effect transistors (HBFETs) comprising a layer of p-type organic poly(3-hexylthiophene) (P3HT) separated from a parallel layer of n-type inorganic zinc oxide (ZnO) were demonstrated by solution processing. In order to achieve balanced hole and electron mobilities, we initially optimized the hole-transporting P3HT channel by the addition of the polar non-solvent acetonitrile (AN) to P3HT solutions in chloroform, which induced a selfassembled nano-fibril morphology and an enhancement of hole mobilities. For the electron channel, a wet-chemically-prepared ZnO layer was optimized by thermal annealing. Unipolar P3HT FET with 5% AN exhibited the highest hole mobility of 7.20 × 10-2 cm2V-1s-1 while the highest electron mobility (3.64 × 10-2 cm2V-1s-1) was observed in unipolar ZnO FETs annealed at 200°C. The organic-inorganic HBFETs consisting of the P3HT layer with 5% AN and ZnO annealed at 200°C exhibited well-balanced hole and electron mobilities of 1.94 × 10-2 cm2V-1s-1 and 1.98 × 10-2 cm2V-1s-1, respectively.

  3. A new model for four-terminal junction field-effect transistors

    NASA Astrophysics Data System (ADS)

    Ding, Hao; Liou, Juin J.; Green, Keith; Cirba, Claude R.

    2006-03-01

    This paper presents a compact and semi-empirical model for a four-terminal (independent top and bottom gates) junction field-effect transistor (JFET). The model describes the steady-state characteristics for all bias conditions with a unified equation. Moreover, the model provides a high degree of accuracy and continuity for the different operation regions, a critical factor for robust analog circuit simulations. Capacitance modeling is also included to describe the JFET small-signal behavior. The model has been implemented in Cadence framework via Verilog-A and compared with data measured from JFETs used at Texas Instruments.

  4. Focused Laser Induced Spatially Controllable p-n junction in Graphene Field-Effect Transistor

    NASA Astrophysics Data System (ADS)

    Kim, Young; Bae, Myung-Ho; Shu, Jung-Tak; Kim, Young; Ahn, Joung; Chun, Seung-Hyun; Park, Yun

    2013-03-01

    Tunable local doping on graphene is an important issue for future graphene-based electronics. Here we investigate a local doping effect by a focused laser irradiation and demonstrate a spatially controllable p-n junction in graphene field-effect transistor. Scanning photocurrent microscopy with varying back-gate voltages reveals the local charge trap in gate oxide near the laser-irradiated region. This is manifested by itself as double peaks in resistance as a function of gate voltage in graphene device, where the region between the double peaks corresponds to the p-n junction. Irradiation of a focused laser on graphene device suggests a new pave to spatially control the doping level, position and size of doped segment on graphene channel in a nondestructive way without high electrical bias, local gate electrode and chemical process. Korea Research Institute of Standards and Science

  5. Giant amplification of tunnel magnetoresistance in a molecular junction: Molecular spin-valve transistor

    SciTech Connect

    Dhungana, Kamal B.; Pati, Ranjit

    2014-04-21

    Amplification of tunnel magnetoresistance by gate field in a molecular junction is the most important requirement for the development of a molecular spin valve transistor. Herein, we predict a giant amplification of tunnel magnetoresistance in a single molecular spin valve junction, which consists of Ru-bis-terpyridine molecule as a spacer between two ferromagnetic nickel contacts. Based on the first-principles quantum transport approach, we show that a modest change in the gate field that is experimentally accessible can lead to a substantial amplification (320%) of tunnel magnetoresistance. The origin of such large amplification is attributed to the spin dependent modification of orbitals at the molecule-lead interface and the resultant Stark effect induced shift in channel position with respect to the Fermi energy.

  6. Refined Transistor Model For Simulation Of SEU

    NASA Technical Reports Server (NTRS)

    Zoutendyk, John A.; Benumof, Reuben

    1988-01-01

    Equivalent base resistance added. Theoretical study develops equations for parameters of Gummel-Poon model of bipolar junction transistor: includes saturation current, amplification factors, charging times, knee currents, capacitances, and resistances. Portion of study concerned with base region goes beyond Gummel-Poon analysis to provide more complete understanding of transistor behavior. Extended theory useful in simulation of single-event upset (SEU) caused in logic circuits by cosmic rays or other ionizing radiation.

  7. Ultra-High Voltage 4H-SiC Bi-Directional Insulated Gate Bipolar Transistors

    NASA Astrophysics Data System (ADS)

    Chowdhury, Sauvik

    4H- Silicon Carbide (4H-SiC) is an attractive material for power semiconductor devices due to its large bandgap, high critical electric field and high thermal conductivity compared to Silicon (Si). For ultra-high voltage applications (BV > 10 kV), 4H-SiC Insulated Gate Bipolar Transistors (IGBTs) are favored over unipolar transistors due to lower conduction losses. With improvements in SiC materials and processing technology, promising results have been demonstrated in the area of conventional unidirectional 4H-SiC IGBTs, with breakdown voltage ratings up to 27 kV. This research presents the experimental demonstration of the world's first high voltage bi-directional power transistors in 4H-SiC. Traditionally, four (two IGBTs and two diodes) or two (two reverse blocking IGBTs) semiconductor devices are necessary to yield a bidirectional switch. With a monolithically integrated bidirectional switch as presented here, the number of semiconductor devices is reduced to only one, which results in increased reliability and reduced cost of the overall system. Additionally, by using the unique dual gate operation of BD-IGBTs, switching losses can be reduced to a small fraction of that in conventional IGBTs, resulting in increased efficiency. First, the performance limits of SiC IGBTs are calculated by using analytical methods. The performance benefits of SiC IGBTs over SiC unipolar devices and Si IGBTs are quantified. Numerical simulations are used to optimize the unit cell and edge termination structures for a 15 kV SiC BD-IGBT. The effect of different device parameters on BD-IGBT static and switching performance are quantified. Second, the process technology necessary for the fabrication of high voltage SiC BD-IGBTs is optimized. The effect of different process steps on parameters such as breakdown voltage, carrier lifetime, gate oxide reliability, SiO2-SiC interface charge density is quantified. A carrier lifetime enhancement process has been optimized for lightly doped

  8. Gallium nitride junction field effect transistors for high-temperature operation

    SciTech Connect

    Zolper, J.C.; Shul, R.J.; Baca, A.G.; Hietala, V.M.; Pearton, S.J.; Stall, R.A.; Wilson, R.G.

    1996-06-01

    GaN is an attractive material for use in high-temperature or high-power electronic devices due to its high bandgap (3.39 eV), high breakdown field ({approximately}5 {times} 10{sup 6} V/cm), high saturation drift velocity (2.7 {times} 10{sup 7} cm/s), and chemical inertness. To this end, Metal Semiconductor FETs (MESFETs), High Electron Mobility Transistors (HEMTs), Heterostructure FETs (HFETs), and Metal Insulator Semiconductor FETs (MISFETs) have all been reported based on epitaxial AlN/GaN structures (Khan 1993a,b; Binari 1994 and 1995). GaN Junction Field Effect Transistors (JFETs), however, had not been reported until recently (Zolper 1996b). JFETs are attractive for high-temperature operation due to the inherently higher thermal stability of the p/n junction gate of a JFET as compared to the Schottky barrier gate of a MESFET or HFET. In this paper the authors present the first results for elevated temperature performance of a GaN JFET. Although the forward gate properties are well behaved at higher temperatures, the reverse characteristics show increased leakage at elevated temperature. However, the increased date leakage alone does not explain the observed increase in drain current with temperature. Therefore, they believe this first device is limited by temperature activated substrate conduction.

  9. Copper-Based OHMIC Contracts for the Si/SiGe Heterojunction Bipolar Transistor Structure

    NASA Technical Reports Server (NTRS)

    Das, Kalyan; Hall, Harvey

    1999-01-01

    Silicon based heterojunction bipolar transistors (HBT) with SiGe base are potentially important devices for high-speed and high-frequency microelectronics. These devices are particularly attractive as they can be fabricated using standard Si processing technology. However, in order to realize the full potential of devices fabricated in this material system, it is essential to be able to form low resistance ohmic contacts using low thermal budget process steps and have full compatibility with VLSI/ULSI processing. Therefore, a study was conducted in order to better understand the contact formation and to develop optimized low resistance contacts to layers with doping densities corresponding to the p-type SiGe base and n-type Si emitter regions of the HBTS. These as-grown doped layers were implanted with BF(sub 2) up to 1 X 10(exp 16)/CM(exp 2) and As up to 5 x 10(exp 15)/CM2, both at 30 keV for the p-type SiGe base and n-type Si emitter layers, respectively, in order to produce a low sheet resistance surface layer. Standard transfer length method (TLM) contact pads on both p and n type layers were deposited using an e-beam evaporated trilayer structure of Ti/CufTi/Al (25)A/1500A/250A/1000A). The TLM pads were delineated by a photoresist lift-off procedure. These contacts in the as-deposited state were ohmic, with specific contact resistances for the highest implant doses of the order of 10(exp -7) ohm-CM2 and lower.

  10. Characteristics of Novel InGaAsN Double Heterojunction Bipolar Transistors

    SciTech Connect

    LI,N.Y.; CHANG,PING-CHIH; BACA,ALBERT G.; LAROCHE,J.R.; REN,F.; ARMOUR,E.; SHARPS,P.R.; HOU,H.Q.

    2000-08-01

    The authors demonstrate, for the first time, both functional Pnp AlGaAs/InGaAsN/GaAs (Pnp InGaAsN) and Npn InGaP/InGaAsN/GaAs (Npn InGaAsN) double heterojunction bipolar transistors (DHBTs) using a 1.2 eV In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} as the base layer for low-power electronic applications. The Pnp InGaAsN DHBT has a peak current gain ({beta}) of 25 and a low turn-on voltage (V{sub ON}) of 0.79 V. This low V{sub ON} is {approximately} 0.25 V lower than in a comparable Pnp AlGAAs/GaAs HBT. For the Npn InGaAsN DHBT, it has a low V{sub ON} of 0.81 V, which is 0.13 V lower than in an InGaP/GaAs HBT. A peak {beta} of 7 with nearly ideal I-V characteristics has been demonstrated. Since GaAs is used as the collector of both Npn and Pnp InGaAsN DHBTs, the emitter-collector breakdown voltage (BV{sub CEO}) are 10 and 12 V, respectively, consistent with the BV{sub CEO} of Npn InGaP/GaAs and Pnp AlGaAs/GaAs HBTs of comparable collector thickness and doping level. All these results demonstrate the potential of InGaAsN DHBTs as an alternative for application in low-power electronics.

  11. InGaAsN/AlGaAs P-n-p heterojunction bipolar transistor

    SciTech Connect

    Chang, P. C.; Baca, A. G.; Li, N. Y.; Sharps, P. R.; Hou, H. Q.; Laroche, J. R.; Ren, F.

    2000-05-08

    We have demonstrated a functional P-n-p heterojunction bipolar transistor (HBT) using InGaAsN. The metalorganic-vapor-phase-epitaxy-grown Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} HBT takes advantage of the narrower band gap energy (E{sub g}=1.2 eV) of In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}, which is lattice matched to GaAs. Compared with the Al{sub 0.3}Ga{sub 0.7}As/GaAs material system, the Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} material system has a larger conduction-band offset, while the valence-band offset remains comparable. This characteristic band alignment is very suitable for P-n-p HBT applications. The device's peak current gain is 23, and it has a turn-on voltage of 0.77 V, which is 0.25 V lower than in a comparable P-n-p Al{sub 0.3}Ga{sub 0.7}As/GaAs HBT. (c) 2000 American Institute of Physics.

  12. Electronic Transport and Quantum Hall Effect in Bipolar Graphene p-n-p Junctions

    NASA Astrophysics Data System (ADS)

    Özyilmaz, Barbaros; Jarillo-Herrero, Pablo; Efetov, Dmitri; Abanin, Dmitry A.; Levitov, Leonid S.; Kim, Philip

    2007-10-01

    We have developed a device fabrication process to pattern graphene into nanostructures of arbitrary shape and control their electronic properties using local electrostatic gates. Electronic transport measurements have been used to characterize locally gated bipolar graphene p-n-p junctions. We observe a series of fractional quantum Hall conductance plateaus at high magnetic fields as the local charge density is varied in the p and n regions. These fractional plateaus, originating from chiral edge states equilibration at the p-n interfaces, exhibit sensitivity to interedge backscattering which is found to be strong for some of the plateaus and much weaker for other plateaus. We use this effect to explore the role of backscattering and estimate disorder strength in our graphene devices.

  13. Single-Shot Charge Readout Using a Cryogenic Heterojunction Bipolar Transistor Preamplifier Inline with a Silicon Single Electron Transistor at Millikelvin Temperatures

    NASA Astrophysics Data System (ADS)

    Curry, Matthew; England, Troy; Wendt, Joel; Pluym, Tammy; Lilly, Michael; Carr, Stephen; Carroll, Malcolm

    Single-shot readout is a requirement for many implementations of quantum information processing. The single-shot readout fidelity is dependent on the signal-to-noise-ratio (SNR) and bandwidth of the readout detection technique. Several different approaches are being pursued to enhance read-out including RF-reflectometry, RF-transmission, parametric amplification, and transistor-based cryogenic preamplification. The transistor-based cryogenic preamplifier is attractive in part because of the reduced experimental complexity compared with the RF techniques. Here we present single-shot charge readout using a cryogenic Heterojunction-Bipolar-Transistor (HBT) inline with a silicon SET charge-sensor at millikelvin temperatures. For the relevant range of HBT DC-biasing, the current gain is 100 to 2000 and the power dissipation is 50 nW to 5 μW, with the microfabricated SET and discrete HBT in an integrated package mounted to the mixing chamber stage of a dilution refrigerator. We experimentally demonstrate a SNR of up to 10 with a bandwidth of 1 MHz, corresponding to a single-shot time-domain charge-sensitivity of approximately 10-4 e / √Hz. This measured charge-sensitivity is comparable to the values reported using the RF techniques. Sandia National Laboratories is a multi-program laboratory operated by Sandia Corporation, a Lockheed-Martin Company, for the U. S. Department of Energy under Contract No. DE-AC04-94AL85000.

  14. Impact ionization in the base of a hot-electron AlSb/InAs bipolar transistor

    NASA Technical Reports Server (NTRS)

    Vengurlekar, Arvind S.; Capasso, Federico; Chiu, T. Heng

    1990-01-01

    The operation of a new AlSb/InAs heterojunction bipolar transistor is studied. The electrons are injected into a p-InAs base across the AlSb/InAs heterojunction. The conduction-band discontinuity at this heterojunction is sufficiently large so that energy of the electrons injected into InAs exceeds the threshold for generating electron-hole pairs by impact ionization. The observed incremental common base current at zero collector-base bias decreases and becomes negative as the emitter current is increased, thus providing direct evidence for impact ionization entirely by band-edge discontinuities.

  15. Modeling and Simulation of - and Silicon Germanium-Base Bipolar Transistors Operating at a Wide Range of Temperatures.

    NASA Astrophysics Data System (ADS)

    Shaheed, M. Reaz

    1995-01-01

    Higher speed at lower cost and at low power consumption is a driving force for today's semiconductor technology. Despite a substantial effort toward achieving this goal via alternative technologies such as III-V compounds, silicon technology still dominates mainstream electronics. Progress in silicon technology will continue for some time with continual scaling of device geometry. However, there are foreseeable limits on achievable device performance, reliability and scaling for room temperature technologies. Thus, reduced temperature operation is commonly viewed as a means for continuing the progress towards higher performance. Although silicon CMOS will be the first candidate for low temperature applications, bipolar devices will be used in a hybrid fashion, as line drivers or in limited critical path elements. Silicon -germanium-base bipolar transistors look especially attractive for low-temperature bipolar applications. At low temperatures, various new physical phenomena become important in determining device behavior. Carrier freeze-out effects which are negligible at room temperature, become of crucial importance for analyzing the low temperature device characteristics. The conventional Pearson-Bardeen model of activation energy, used for calculation of carrier freeze-out, is based on an incomplete picture of the physics that takes place and hence, leads to inaccurate results at low temperatures. Plasma -induced bandgap narrowing becomes more pronounced in device characteristics at low temperatures. Even with modern numerical simulators, this effect is not well modeled or simulated. In this dissertation, improved models for such physical phenomena are presented. For accurate simulation of carrier freeze-out, the Pearson-Bardeen model has been extended to include the temperature dependence of the activation energy. The extraction of the model is based on the rigorous, first-principle theoretical calculations available in the literature. The new model is shown

  16. Theoretical results on the tandem junction solar cell based on its Ebers-Moll transistor model

    NASA Technical Reports Server (NTRS)

    Goradia, C.; Vaughn, J.; Baraona, C. R.

    1980-01-01

    A one-dimensional theoretical model of the tandem junction solar cell (TJC) with base resistivity greater than about 1 ohm-cm and under low level injection has been derived. This model extends a previously published conceptual model which treats the TJC as an npn transistor. The model gives theoretical expressions for each of the Ebers-Moll type currents of the illuminated TJC and allows for the calculation of the spectral response, I(sc), V(oc), FF and eta under variation of one or more of the geometrical and material parameters and 1MeV electron fluence. Results of computer calculations based on this model are presented and discussed. These results indicate that for space applications, both a high beginning of life efficiency, greater than 15% AM0, and a high radiation tolerance can be achieved only with thin (less than 50 microns) TJC's with high base resistivity (greater than 10 ohm-cm).

  17. Impact of gate workfunction in junctionless versus junction SOI n-MOSFET transistor

    NASA Astrophysics Data System (ADS)

    Huda, A. R. N.; Arshad, M. K. Md.; Othman, Noraini; Voon, C. H.; Liu, Wei-Wen; Hashim, U.; Lee, H. Cheun; Adelyn, P. Y. P.; Kahar, S. M.

    2016-07-01

    In this paper, the effect of gate workfunction variation on DC characteristics in 100 nm gate length silicon-on-insulator (SOI) junctionless (JL) and junction transistors has been investigated by using numerical simulations. The digital figure-of-merits characteristics such as threshold voltage (VTH), on/off-current ratio, subthreshold voltage, and drain-induced-barrier-lowering are the main parameters that have been investigated. The rate of change in VTH with the respect to gate workfunction for both JLT and JT devices was almost same. Besides that, it shows the designated JLT device is achieving full-depletion at higher gate workfunction of more than 5.0 eV whereas the designated JT device is more wider range, ranging from low, mid-gap or high workfunction.

  18. Fully transparent organic transistors with junction-free metallic network electrodes

    SciTech Connect

    Pei, Ke; Wang, Zongrong; Ren, Xiaochen; Zhang, Zhichao; Peng, Boyu; Chan, Paddy K. L.

    2015-07-20

    We utilize highly transparent, junction-free metal network electrodes to fabricate fully transparent organic field effect transistors (OFETs). The patterned transparent Ag networks are developed by polymer crack template with adjustable line width and density. Sheet resistance of the network is 6.8 Ω/sq and optical transparency in the whole visible range is higher than 80%. The bottom contact OFETs with DNTT active layer and parylene-C dielectric insulator show a maximum field-effect mobility of 0.13 cm{sup 2}/V s (average mobility is 0.12 cm{sup 2}/V s) and on/off ratio is higher than 10{sup 7}. The current OFETs show great potential for applications in the next generation of transparent and flexible electronics.

  19. Large-Signal Characterization and Modeling of the Heterojunction Bipolar Transistor

    NASA Astrophysics Data System (ADS)

    Teeter, Douglas Andrew

    1992-01-01

    Rapid improvements in Heterojunction Bipolar Transistor (HBT) device performance have made power applications in the millimeter wave regime possible. Improved large-signal modeling and characterization techniques are required for designing circuits at these frequencies. Several large-signal modeling approaches are investigated in this thesis. The most detailed model involves numerically solving moments of the Boltzmann Transport Equation. Velocity overshoot and energy relaxation effects are included in this model. After a detailed description of the numerical techniques is given, the model is used to investigate HBT operation under large-signal steady state RF conditions. Internal device carrier concentrations, electric fields, electron temperature, and electron velocity are determined at various stages during the RF cycle. While the model is a valuable tool for studying the internal device physics, its use in circuit design applications is limited due to the computer time required. The fully numerical model is then used to investigate several simpler large-signal HBT models. It is found that the commonly used Gummel-Poon model exhibits poor agreement with numerical and experimental data at millimeter wave frequencies due to neglect of transit time delays. A modified Ebers-Moll model is described which overcomes this problem by implementing the transit time delay in the frequency domain. Two large-signal measurement systems covering 8 to 35 GHz were built to compare simulated results with experimental data. A commercial tuner system was used to make measurements from 8 to 16 GHz. However, to measure beyond 26 GHz, an active loadpull system was designed and constructed to circumvent problems created by component losses. Details of this measurement system, its accuracy, and error correction techniques are given. Good agreement between measured and modeled output power, gain compression, and efficiency is obtained using the modified Ebers-Moll model over a wide range

  20. Comparison of total dose effects on SiGe heterojunction bipolar transistors induced by different swift heavy ion irradiation

    NASA Astrophysics Data System (ADS)

    Sun, Ya-Bin; Fu, Jun; Xu, Jun; Wang, Yu-Dong; Zhou, Wei; Zhang, Wei; Cui, Jie; Li, Gao-Qing; Liu, Zhi-Hong

    2014-11-01

    The degradations in NPN silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) were fully studied in this work, by means of 25-MeV Si, 10-MeV Cl, 20-MeV Br, and 10-MeV Br ion irradiation, respectively. Electrical parameters such as the base current (IB), current gain (β), neutral base recombination (NBR), and Early voltage (VA) were investigated and used to evaluate the tolerance to heavy ion irradiation. Experimental results demonstrate that device degradations are indeed radiation-source-dependent, and the larger the ion nuclear energy loss is, the more the displacement damages are, and thereby the more serious the performance degradation is. The maximum degradation was observed in the transistors irradiated by 10-MeV Br. For 20-MeV and 10-MeV Br ion irradiation, an unexpected degradation in IC was observed and Early voltage decreased with increasing ion fluence, and NBR appeared to slow down at high ion fluence. The degradations in SiGe HBTs were mainly attributed to the displacement damages created by heavy ion irradiation in the transistors. The underlying physical mechanisms are analyzed and investigated in detail.

  1. Optical orientation in bipolar spintronic devices

    NASA Astrophysics Data System (ADS)

    Fabian, Jaroslav; Žutić, Igor

    2008-11-01

    Optical orientation is a highly efficient tool for the generation of nonequilibrium spin polarization in semiconductors. Combined with spin-polarized transport it offers new functionalities for conventional electronic devices, such as pn junction bipolar diodes or transistors. In nominally nonmagnetic junctions optical orientation can provide a source for spin capacitance—the bias-dependent nonequilibrium spin accumulation—or for spin-polarized current in bipolar spin-polarized solar cells. In magnetic junctions, the nonequilibrium spin polarization generated by spin orientation in the proximity of an equilibrium magnetization gives rise to the spin-voltaic effect (a realization of the Silsbee-Johnson coupling), enabling efficient control of electrical properties such as the I-V characteristics of the junctions by magnetic and optical fields. This paper reviews the main results of investigations of spin-polarized and magnetic pn junctions, from spin capacitance to the spin-voltaic effect.

  2. Compact Modeling of Floating-Base Effect in Injection-Enhanced Insulated-Gate Bipolar Transistor Based on Potential Modification by Accumulated Charge

    NASA Astrophysics Data System (ADS)

    Yamamoto, Takao; Miyake, Masataka; Miura-Mattausch, Mitiko

    2013-04-01

    We have developed a compact model of the injection-enhanced insulated-gate bipolar transistor (IGBT) applicable for circuit optimization. The main development is modeling the hole accumulation in the floating-base region. It is demonstrated that the observed negative gate capacitance is well reproduced with the developed model.

  3. Design, fabrication, and analysis of p-channel arsenide/antimonide hetero-junction tunnel transistors

    SciTech Connect

    Rajamohanan, Bijesh Mohata, Dheeraj; Hollander, Matthew; Datta, Suman; Zhu, Yan; Hudait, Mantu; Jiang, Zhengping; Klimeck, Gerhard

    2014-01-28

    In this paper, we demonstrate InAs/GaSb hetero-junction (hetJ) and GaSb homo-junction (homJ) p-channel tunneling field effect transistors (pTFET) employing a low temperature atomic layer deposited high-κ gate dielectric. HetJ pTFET exhibited drive current of 35 μA/μm in comparison to homJ pTFET, which exhibited drive current of 0.3 μA/μm at V{sub DS} = −0.5 V under DC biasing conditions. Additionally, with pulsing of 1 μs gate voltage, hetJ pTFET exhibited enhanced drive current of 85 μA/μm at V{sub DS} = −0.5 V, which is the highest reported in the category of III-V pTFET. Detailed device characterization was performed through analysis of the capacitance-voltage characteristics, pulsed current-voltage characteristics, and x-ray diffraction studies.

  4. Programmable Schottky Junctions Based on Ferroelectric Gated MoS2 Transistors

    NASA Astrophysics Data System (ADS)

    Xiao, Zhiyong; Song, Jingfeng; Drcharme, Stephen; Hong, Xia

    We report a programmable Schottky junction based on MoS2 field effect transistors with a SiO2 back gate and a ferroelectric copolymer poly(vinylidene-fluoride-trifluorethylene) (PVDF) top gate. We fabricated mechanically exfoliated single layer MoS2 flakes into two point devices via e-beam lithography, and deposited on the top of the devices ~20 nm PVDF thin films. The polarization of the PVDF layer is controlled locally by conducting atomic force microscopy. The devices exhibit linear ID-VD characteristics when the ferroelectric gate is uniformly polarized in one direction. We then polarized the gate into two domains with opposite polarization directions, and observed that the ID-VD characteristics of the MoS2 channel can be modulated between linear and rectified behaviors depending on the back gate voltage. The nonlinear ID-VD relation emerges when half of the channel is in the semiconductor phase while the other half is in the metallic phase, and it can be well described by the thermionic emission model with a Schottky barrier of ~0.5 eV. The Schottky junction can be erased by re-write the entire channel in the uniform polarization state. Our study facilitates the development of programmable, multifunctional nanoelectronics based on layered 2D TMDs..

  5. Forward-bias tunneling - A limitation to bipolar device scaling

    NASA Technical Reports Server (NTRS)

    Del Alamo, Jesus A.; Swanson, Richard M.

    1986-01-01

    Forward-bias tunneling is observed in heavily doped p-n junctions of bipolar transistors. A simple phenomenological model suitable to incorporation in device codes is developed. The model identifies as key parameters the space-charge-region (SCR) thickness at zero bias and the reduced doping level at its edges which can both be obtained from CV characteristics. This tunneling mechanism may limit the maximum gain achievable from scaled bipolar devices.

  6. Analysis of high-voltage metal–oxide–semiconductor transistors with gradual junction in the drift region

    NASA Astrophysics Data System (ADS)

    Chen, Jone F.; Ai, Teng-Jen; Tsai, Yan-Lin; Hsu, Hao-Tang; Chen, Chih-Yuan; Hwang, Hann-Ping

    2016-08-01

    The device characteristics and hot-carrier-induced degradation of high-voltage n-type metal–oxide–semiconductor transistors with traditional and gradual junctions in the drift region are studied in this work. The gradual junction used in this study is realized by self-aligned N‑ implantation through dual thicknesses of screen oxide during N‑ drift implantation. Compared with traditional devices, devices with gradual junctions have improved off-state breakdown voltage (V BD) without sacrificing on-state driving current and hot-carrier-induced degradation. More improvement in V BD is observed if the dimensions of the device are larger. The mechanism responsible for V BD improvement in devices with gradual junctions is also investigated by using technology computer-aided-design simulations.

  7. Antenna-Coupled Superconducting Tunnel Junctions with Single-Electron Transistor Readout for Detection of Sub-mm Radiation

    NASA Technical Reports Server (NTRS)

    Stevenson, T. R.; Hsieh, W.-T.; Li, M. J.; Stahle, C. M.; Wollack, E. J.; Schoelkopf, R. J.; Teufel, J.; Krebs, Carolyn (Technical Monitor)

    2002-01-01

    Antenna-coupled superconducting tunnel junction detectors have the potential for photon-counting sensitivity at sub-mm wavelengths. The device consists of an antenna structure to couple radiation into a small superconducting volume and cause quasiparticle excitations, and a single-electron transistor to measure currents through tunnel junction contacts to the absorber volume. We will describe optimization of device parameters, and recent results on fabrication techniques for producing devices with high yield for detector arrays. We will also present modeling of expected saturation power levels, antenna coupling, and rf multiplexing schemes.

  8. All-optical transistors and logic gates using a parity-time-symmetric Y-junction: Design and simulation

    SciTech Connect

    Ding, Shulin; Wang, Guo Ping

    2015-09-28

    Classical nonlinear or quantum all-optical transistors are dependent on the value of input signal intensity or need extra co-propagating beams. In this paper, we present a kind of all-optical transistors constructed with parity-time (PT)-symmetric Y-junctions, which perform independently on the value of signal intensity in an unsaturated gain case and can also work after introducing saturated gain. Further, we show that control signal can switch the device from amplification of peaks in time to transformation of peaks to amplified troughs. By using these PT-symmetric Y-junctions with currently available materials and technologies, we can implement interesting logic functions such as NOT and XOR (exclusive OR) gates, implying potential applications of such structures in designing optical logic gates, optical switches, and signal transformations or amplifications.

  9. Low-temperature characteristics of the current gain of GaN/InGaN double-heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Nishikawa, Atsushi; Kumakura, Kazuhide; Kasu, Makoto; Makimoto, Toshiki

    2009-05-01

    We investigated the temperature dependence of the current gain of npn-type GaN/InGaN double-heterojunction bipolar transistors (DHBTs) in the low-temperature region. The current gain increased with decrease in device temperature due to the reduction of the recombination current in the p-type base layer. The current gain reached as high as 5000 at 40 K, which is the highest among nitride-based HBTs. For conventional HBTs made of InP or GaAs, the current gain decreased with decreasing device temperature. However, no reduction of the current gain was observed in this study, suggesting that the minority carrier mobility in the p-type InGaN base layer has negative temperature dependence, presumably because the ionized impurity scattering is relatively unaffected owing to the carrier freezeout and the high activation energy of Mg in the p-InGaN base layer.

  10. The Aluminum-Free P-n-P InGaAsN Double Heterojunction Bipolar Transistors

    SciTech Connect

    CHANG,PING-CHIH; LI,N.Y.; BACA,ALBERT G.; MONIER,C.; LAROCHE,J.R.; HOU,H.Q.; REN,F.; PEARTON,S.J.

    2000-08-01

    The authors have demonstrated an aluminum-free P-n-P GaAs/InGaAsN/GaAs double heterojunction bipolar transistor (DHBT). The device has a low turn-on voltage (V{sub ON}) that is 0.27 V lower than in a comparable P-n-p AlGaAs/GaAs HBT. The device shows near-ideal D. C. characteristics with a current gain ({beta}) greater than 45. The high-speed performance of the device are comparable to a similar P-n-p AlGaAs/GaAs HBT, with f{sub T} and f{sub MAX} values of 12 GHz and 10 GHz, respectively. This device is very suitable for low-power complementary HBT circuit applications, while the aluminum-free emitter structure eliminates issues typically associated with AlGaAs.

  11. Electrical stress-induced instability of amorphous indium-gallium-zinc oxide thin-film transistors under bipolar ac stress

    SciTech Connect

    Lee, Sangwon; Jeon, Kichan; Park, Jun-Hyun; Kim, Sungchul; Kong, Dongsik; Kim, Dong Myong; Kim, Dae Hwan; Kim, Sangwook; Kim, Sunil; Hur, Jihyun; Park, Jae Chul; Song, Ihun; Kim, Chang Jung; Park, Youngsoo; Jung, U-In

    2009-09-28

    Bipolar ac stress-induced instability of amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors is comparatively investigated with that under a positive dc gate bias stress. While the positive dc gate bias stress-induced threshold voltage shift ({delta}V{sub T}) is caused by the charge trapping into the interface/gate dielectric as reported in previous works, the dominant mechanism of the ac stress-induced {delta}V{sub T} is observed to be due to the increase in the acceptorlike deep states of the density of states (DOS) in the a-IGZO active layer. Furthermore, it is found that the variation of deep states in the DOS makes a parallel shift in the I{sub DS}-V{sub GS} curve with an insignificant change in the subthreshold slope, as well as the deformation of the C{sub G}-V{sub G} curves.

  12. Physical modeling based on hydrodynamic simulation for the design of InGaAs/InP double heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Ge, Ji; Liu, Hong-Gang; Su, Yong-Bo; Cao, Yu-Xiong; Jin, Zhi

    2012-05-01

    A physical model for scaling and optimizing InGaAs/InP double heterojunction bipolar transistors (DHBTs) based on hydrodynamic simulation is developed. The model is based on the hydrodynamic equation, which can accurately describe non-equilibrium conditions such as quasi-ballistic transport in the thin base and the velocity overshoot effect in the depleted collector. In addition, the model accounts for several physical effects such as bandgap narrowing, variable effective mass, and doping-dependent mobility at high fields. Good agreement between the measured and simulated values of cutoff frequency, ft, and maximum oscillation frequency, fmax, are achieved for lateral and vertical device scalings. It is shown that the model in this paper is appropriate for downscaling and designing InGaAs/InP DHBTs.

  13. Effect of composite collector design on the breakdown behavior of InGaP/GaAs double heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Lew, K. L.; Yoon, S. F.

    2003-01-01

    A series of experiments and calculations has been carried out to study the effect of different composite collector designs on InGaP/GaAs/InGaP double heterojunction bipolar transistor breakdown characteristics. A comparison between uncorrected and dead-space corrected models was carried out, and it was found that the dead-space effect is dominant for collector thickness below 300 nm. However, this effect can be neglected for collector thickness larger than 500 nm. The role of lightly doped GaAs (n--GaAs) and heavily doped InGaP (N+-InGaP) spacer layers is discussed systematically to establish a criterion for designing the composite collector structure. The experimental and theoretical results show that it is necessary to keep the sum of n--GaAs and N+-InGaP spacer layer thickness below 50 nm to avoid significant degradation of the device breakdown characteristics.

  14. Degradation of dc characteristics of InGaAs/InP single heterojunction bipolar transistors under electron irradiation

    SciTech Connect

    Bandyopadhyay, A.; Subramanian, S.; Chandrasekhar, S.; Dentai, A.G.; Goodnick, S.M.

    1999-05-01

    The effects of high-energy ({approximately}1 MeV) electron irradiation on the dc characteristics of InGaAs/InP single heterojunction bipolar transistors (SHBT`s) are investigated. The device characteristics do not show any significant change for electron doses <10{sup 15}/cm{sup 2}. For higher doses, devices show a decrease in collector current, a degradation of common-emitter current gain, an increase in collector saturation voltage and an increase in the collector output conductance. A simple SPICE-like device model is developed to describe the dc characteristics of SHBT`s. The model parameters extracted from the measured dc characteristics of the devices before and after irradiation are used to get an insight into the physical mechanisms responsible for the degradation of the devices.

  15. Influence of the external component on the damage of the bipolar transistor induced by the electromagnetic pulse

    NASA Astrophysics Data System (ADS)

    Xiaowen, Xi; Changchun, Chai; Xingrong, Ren; Yintang, Yang; Zhenyang, Ma; Jing, Wang

    2010-07-01

    A study on the influence of the external resistor and the external voltage source during the injection of the electromagnetic pulse (EMP) into the bipolar transistor (BJT) is carried out. Research shows that the increase of the external resistor Rb at base makes the burnout time of the device decrease slightly, the increase of the external voltage source Vbe at base can aid the damage of the device when the magnitude of the injecting voltage is relatively low and has little influence when the magnitude is sufficiently high causing the device appearing the PIN structure damage, and the increase of the external resistor Re can remarkably reduce the voltage drops added to the device and improve the durability of the device. In the final analysis, the effect of the external circuit component on the BJT damage is the influence on the condition which makes the device appear current-mode second breakdown.

  16. SEMICONDUCTOR DEVICES: EMP injection damage effects of a bipolar transistor and its relationship between the injecting voltage and energy

    NASA Astrophysics Data System (ADS)

    Xiaowen, Xi; Changchun, Chai; Xingrong, Ren; Yintang, Yang; Bing, Zhang; Xiao, Hong

    2010-04-01

    The response of a bipolar transistor (BJT) under a square-wave electromagnetic pulse (EMP) with different injecting voltages is investigated. Adopting the curve fitting method, the relationship between the burnout time, the damage energy and the injecting voltage is obtained. Research shows that the damage energy is not a constant value, but changes with the injecting voltage level. By use of the device simulator Medici, the internal behavior of the burned device is analyzed. Simulation results indicate that the variation of the damage energy with injecting voltage is caused by the distribution change of hot spot position under different injection levels. Therefore, the traditional way to evaluate the trade-off between the burnout time and the injecting voltage is not comprehensive due to the variation of the damage energy.

  17. Computer-aided prediction of high-frequency performance limits in silicon bipolar integrated circuits

    NASA Technical Reports Server (NTRS)

    Burns, J. L.; Choma, J., Jr.

    1982-01-01

    A circuit model for an existing silicon integrated bipolar junction transistor (IBJT) is used to evaluate presently achievable high frequency circuit performance. The relationship between circuit model and processing parameters are semi-quantitatively explored to make predictions on the frequency response, which can be achieved through realistic device fabrication modifications. A new figure of merit is introduced, which is defined as the signal frequency at which an integrated bipolar junction transistor can deliver a power gain of G. The most sensitive parameter influencing attainable high frequency IBJT performance is base resistance.

  18. Simulation of Npn and Pnp AlGaN/GaN heterojunction bipolar transistors performances: Limiting factors and optimum design

    SciTech Connect

    MONIER,C.; REN,F.; HAN,JUNG; CHANG,PING-CHIH; SHUL,RANDY J.; LEE,K.P.; ZHANG,A.P.; BACA,ALBERT G.; PEARTON,S.J.

    2000-04-25

    The performance capabilities of Npn and Pnp AlGaN/GaN heterojunction bipolar transistors have been investigated by using a drift-diffusion transport model. Numerical results have been employed to study the effect of the p-type Mg doping and its incomplete ionization on device performance. The high base resistance induced by the deep acceptor level is found to be the cause of limited current gain values for Npn devices. Several computation approaches have been considered to improve their performance. Reasonable improvement of the DC current gain {beta} is observed by realistically reducing the base thickness in accordance with processing limitations. Base transport enhancement is also predicted by the introduction of a quasi-electric field in the base. The impact of the base resistivity on high-frequency characteristics is investigated for Npn AlGaN/GaN devices. Optimized predictions with maximum oscillation frequency value as high as f{sub MAX} = 20 GHz and a unilateral power gain--U = 25 dB make this bipolar GaN-based technology compatible with communication applications. Simulation results reveal that the restricted amount of free carriers from the p-doped emitter limits Pnp's DC performances operating in common emitter configuration. A preliminary analysis of r.f. characteristics for the Pnp counterpart indicates limited performance mainly caused by the degraded hole mobility.

  19. A doping concentration-dependent upper limit of the breakdown voltage cutoff frequency product in Si bipolar transistors

    NASA Astrophysics Data System (ADS)

    Rieh, Jae-Sung; Jagannathan, Basanth; Greenberg, David; Freeman, Greg; Subbanna, Seshadri

    2004-02-01

    Recent high-speed Si-based bipolar transistors apparently exceed the Johnson Limit in terms of breakdown voltage-cutoff frequency product, and this paper addresses the relevant issues. First, BV CES rather than BV CEO is shown to be the representative breakdown voltage in describing the breakdown-speed trade-off in collector design, since BV CEO is modulated by the current gain which is irrelevant of the collector design and also practical bipolar circuits are rarely operated with open-base condition for which BV CEO is defined. In the same context, it is suggested BV CES be employed in representing the upper limit of breakdown voltage-cutoff frequency product. Second, a collector doping concentration-dependent upper limit of BV CES· fT product is proposed incorporating the doping concentration-dependent critical electric field and accurate values for related device parameters. With this new approach, it is shown that the limit is far larger than the Johnson Limit and the limit is still yet to be reached.

  20. Incorporation of the silicon germanium carbon compound in the realization of a bipolar inversion channel field-effect transistor (BICFET)

    NASA Astrophysics Data System (ADS)

    Sharer, Deborah Louise

    The feasibility of fabrication of an inversion base transistor in the BICFET (Bipolar Inversion Channel Field Effect Transistor) configuration is investigated in this project. The requisite heterostructure will be realized through the extensive use of the silicon germanium carbon compound Si1-x-yGexCy. It is anticipated that band offsets comparable to Si1-xGex(x ˜ 0.5) will be achieved without the inherent difficulties associated with induced strains and epilayer thickness limitations present in this system. Initial explorations will be carried out through utilization of software acquired from Technology Modeling Associates, Sunnyvale, California. Simulations will be accomplished through the use of the Medici software, which is capable of modeling semiconductor devices comprised of conventional and/or user defined materials, impurities, structures and operating conditions. The Medici package, in conjunction with the Heterojunction Device Advanced Application Module (AAM), the Lattice Temperature AAK the Trapped Charge AAK and the Anisotropic Material AAK will also allow prediction of the electrical properties and characteristics of semiconductor devices composed of anisotropic media that possess a discontinuous band structure and inevitable defect constraints under variable thermal conditions. Through the capability of user defined compounds, the effect of incorporating carbon into Si1--xGex will be explored and internal device operation, as well as any breakdown or failure mechanisms allowed for in the software, will be determined.

  1. Fabrication and characterization of GaN junction field effect transistors

    SciTech Connect

    Zhang, L.; Lester, L.F.; Baca, A.G.; Shul, R.J.; Chang, P.C.; Willison, C.L.; Mishra, U.K.; Denbaars, S.P.; Zolper, J.C.

    2000-01-11

    Junction field effect transistors (JFET) were fabricated on a GaN epitaxial structure grown by metal organic chemical vapor deposition. The DC and microwave characteristics, as well as the high temperature performance of the devices were studied. These devices exhibited excellent pinch-off and a breakdown voltage that agreed with theoretical predictions. An extrinsic transconductance (g{sub m}) of 48 mS/mm was obtained with a maximum drain current (I{sub D}) of 270 mA/mm. The microwave measurement showed an f{sub T} of 6 GHz and an f{sub max} of 12 GHz. Both the I{sub D} and the g{sub m} were found to decrease with increasing temperature, possibly due to lower electron mobility at elevated temperatures. These JFETs exhibited a significant current reduction after a high drain bias was applied, which was attributed to a partially depleted channel caused by trapped electrons in the semi-insulating GaN buffer layer.

  2. Molecular beam epitaxy of gallium arsenide antimonide-based ultra-high-speed double heterojunction bipolar transistors and light emitting transistors

    NASA Astrophysics Data System (ADS)

    Wu, Bing-Ruey

    In this work, GaAsSb-based double heterojunction bipolar transistors (DHBTs) and light emitting transistors (LETs) are grown using gas source molecular beam epitaxy (GSMBE). High-speed GaAs0.5Sb0.5/InP DHBTs are developed through the exercise of GSMBE growth optimization, device fabrication, and characterization. By adjusting the growth temperature and V/III flux ratio, the optimal conditions for growing GaAs0.5Sb0.5 base are found to be at high growth temperature and low V/III ratio. The switching sequence is also optimized so that the Sb segregation effect is minimized. By using GaAs0.5Sb0.5-In0.2Ga0.8As 0.7Sb0.3 compositional grading in the base of the GaAsSb/InP DHBT, a significant improvement of fT from 380 GHz to 500 GHz was achieved compared to a uniform GaAs0.5Sb 0.5 DHBT, while maintaining a high breakdown voltage BVCEO ˜ 4V. The cutoff frequency---breakdown voltage product, fT·BVCEO, of over 2000 GHz-V, is the record value for DHBTs of any material system. Incorporating graded InAs-InGaAs emitter contact layer is also shown to effectively reduce the total emitter resistance, further improving the DHBT high speed performance. LET characteristics with quantum wells (QWs) inserted into the base region of GaAsSb/InP DHBTs are also investigated and the preliminary results are presented. An LET with a tensile strained InGaAsSb/GaAs0.65Sb 0.35 DQW in the base was designed and achieved the emission wavelength of ˜1.6 mum, despite of its low light output intensity. The potential and limitation of realizing a transistor laser with an emission wavelength of 1.55 mum using GaAsSb/InP material system will be discussed.

  3. Comments on determination of bandgap narrowing from activation plots. [for bipolar transistors

    NASA Technical Reports Server (NTRS)

    Park, J.-S.; Neugroschel, A.; Lindholm, F. A.

    1986-01-01

    A determination is made of the temperature-dependence of emitter saturation current in bipolar devices which allows the derivation of a value for bandgap narrowing that is in better agreement with other determinations than previous results based on ohmic contact measurements of temperature dependence. The new values were obtained by varying the surface recombination velocity at the emitter surface. This improves accuracy by varying the minority carrier surface recombination velocity at the emitter contacts of otherwise indistinguishable emitters.

  4. High current gain 4H-SiC bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Yourun, Zhang; Jinfei, Shi; Ying, Liu; Chengchun, Sun; Fei, Guo; Bo, Zhang

    2016-04-01

    A novel 4H-SiC BJT of high current gain with a suppressing surface traps effect has been proposed. It is effective to improve the current gain due to the lower electrons density in the surface region by extending the emitter metal to overlap the passivation layer on the extrinsic base surface. The electrons trapped in the extrinsic base surface induce the degeneration of SiC BJTs device performance. By modulating the electron recombination rate, the novel structure can increase the current gain to 63.2% compared with conventional ones with the compatible process technology. Optimized sizes are an overlapped metal length of 4 μm, as well as an oxide layer thickness of 50 nm. Project supported by the National Natural Science Foundation of China (Nos. 61306093, 61401075).

  5. Effect of Mg ionization efficiency on performance of Npn AlGaN/GaN heterojunction bipolar transistors

    SciTech Connect

    MONIER,C.; PEARTON,S.J.; CHANG,PING-CHIH; BACA,ALBERT G.

    2000-03-10

    A drift-diffusion transport model has been used to examine the performance capabilities of AlGaN/GaN Npn heterojunction bipolar transistors (HBTs). The Gummel plot from the first GaN-based HBT structure recently demonstrated is adjusted with simulation by using experimental mobility and lifetime reported in the literature. Numerical results have been explored to study the effect of the p-type Mg doping and its incomplete ionization in the base. The high base resistance induced by the deep acceptor level is found to be the cause of limiting current gain values. Increasing the operating temperature of the device activates more carriers in the base. An improvement of the simulated current gain by a factor of 2 to 4 between 25 and 300 C agrees well with the reported experimental results. A preliminary analysis of high frequency characteristics indicates substantial progress of predicted rf performances by operating the device at higher temperature due to a reduced extrinsic base resistivity.

  6. AlGaAs/InGaAsN/GaAs PnP double heterojunction bipolar transistor

    SciTech Connect

    Chang, P.C.; Baca, A.G.; Li, N.Y.; Sharps, P.R.; Hou, H.Q.; Laroche, J.R.; Ren, F.

    2000-01-04

    The authors demonstrated a functional PnP double heterojunction bipolar transistor (DHBT) using AlGaAs, InGaAsN, and GaAs. The band alignment between InGaAsN and GaAs has a large {triangle}E{sub c} and negligible {triangle}E{sub v}, this unique characteristic is very suitable for PnP DHBT applications. The metalorganic vapor phase epitaxy (MOCVD) grown Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}/GaAs PnP DHBT is lattice matched to GaAs and has a peak current gain of 25. Because of the smaller bandgap (E{sub g}=1.20eV) of In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} used for the base layer, this device has a low V{sub ON} of 0.79 V, which is 0.25 V lower than in a comparable Pnp AlGaAs/GaAs HBT. And because GaAs is used for the collector, its BV{sub CEO} is 12 V, consistent with BV{sub CEO} of AlGaAs/GaAs HBTs.

  7. DC modeling and characterization of AlGaAs/GaAs heterojunction bipolar transistors for high-temperature applications

    SciTech Connect

    Dikmen, C.T.; Dogan, N.S.; Osman, M.A. . School of Electrical Engineering and Computer Science)

    1994-02-01

    There is currently a demand for active electronic devices operating reliably over wide range of temperatures. Potential applications for the high-temperature devices and integrated circuits are in the areas of jet engine and control instrumentation for nuclear power plants. Here, the large signal dc characteristics of AlGaAs/GaAs heterojunction bipolar transistors (HBT) at high temperatures (27--300 C) are reported. A high-temperature SPICE model is developed which includes the recombination-generation current components and avalanche multiplication which become extremely important at high temperatures. The effect of avalanche breakdown is also included to model the current due to thermal generation of electron/hole pairs causing breakdown at high temperatures. A parameter extraction program is developed used to extract the model parameters of HBT's at different temperatures. Fitting functions for the model parameters as a function of temperature are developed. These parameters are then used in the SPICE Ebers-Moll model for the dc characterization of the HBT at any temperature between (27--300 C).

  8. A 65-kV insulated gate bipolar transistor switch applied in damped AC voltages partial discharge detection system.

    PubMed

    Jiang, J; Ma, G M; Luo, D P; Li, C R; Li, Q M; Wang, W

    2014-02-01

    Damped AC voltages detection system (DAC) is a productive way to detect the faults in power cables. To solve the problems of large volume, complicated structure and electromagnetic interference in existing switches, this paper developed a compact solid state switch based on electromagnetic trigger, which is suitable for DAC test system. Synchronous electromagnetic trigger of 32 Insulated Gate Bipolar Transistors (IGBTs) in series was realized by the topological structure of single line based on pulse width modulation control technology. In this way, external extension was easily achieved. Electromagnetic trigger and resistor-capacitor-diode snubber circuit were optimized to reduce the switch turn-on time and circular layout. Epoxy encapsulating was chosen to enhance the level of partial discharge initial voltage (PDIV). The combination of synchronous trigger and power supply is proposed to reduce the switch volume. Moreover, we have overcome the drawback of the electromagnetic interference and improved the detection sensitivity of DAC by using capacitor storage energy to maintain IGBT gate driving voltage. The experimental results demonstrated that the solid-state switch, with compact size, whose turn-on time was less than 400 ns and PDIV was more than 65 kV, was able to meet the actual demands of 35 kV DAC test system. PMID:24593382

  9. A 65-kV insulated gate bipolar transistor switch applied in damped AC voltages partial discharge detection system

    NASA Astrophysics Data System (ADS)

    Jiang, J.; Ma, G. M.; Luo, D. P.; Li, C. R.; Li, Q. M.; Wang, W.

    2014-02-01

    Damped AC voltages detection system (DAC) is a productive way to detect the faults in power cables. To solve the problems of large volume, complicated structure and electromagnetic interference in existing switches, this paper developed a compact solid state switch based on electromagnetic trigger, which is suitable for DAC test system. Synchronous electromagnetic trigger of 32 Insulated Gate Bipolar Transistors (IGBTs) in series was realized by the topological structure of single line based on pulse width modulation control technology. In this way, external extension was easily achieved. Electromagnetic trigger and resistor-capacitor-diode snubber circuit were optimized to reduce the switch turn-on time and circular layout. Epoxy encapsulating was chosen to enhance the level of partial discharge initial voltage (PDIV). The combination of synchronous trigger and power supply is proposed to reduce the switch volume. Moreover, we have overcome the drawback of the electromagnetic interference and improved the detection sensitivity of DAC by using capacitor storage energy to maintain IGBT gate driving voltage. The experimental results demonstrated that the solid-state switch, with compact size, whose turn-on time was less than 400 ns and PDIV was more than 65 kV, was able to meet the actual demands of 35 kV DAC test system.

  10. Magnetic Vortex Based Transistor Operations

    PubMed Central

    Kumar, D.; Barman, S.; Barman, A.

    2014-01-01

    Transistors constitute the backbone of modern day electronics. Since their advent, researchers have been seeking ways to make smaller and more efficient transistors. Here, we demonstrate a sustained amplification of magnetic vortex core gyration in coupled two and three vortices by controlling their relative core polarities. This amplification is mediated by a cascade of antivortex solitons travelling through the dynamic stray field. We further demonstrated that the amplification can be controlled by switching the polarity of the middle vortex in a three vortex sequence and the gain can be controlled by the input signal amplitude. An attempt to show fan–out operation yielded gain for one of the symmetrically placed branches which can be reversed by switching the core polarity of all the vortices in the network. The above observations promote the magnetic vortices as suitable candidates to work as stable bipolar junction transistors (BJT). PMID:24531235

  11. Graded junction termination extensions for electronic devices

    NASA Technical Reports Server (NTRS)

    Merrett, J. Neil (Inventor); Isaacs-Smith, Tamara (Inventor); Sheridan, David C. (Inventor); Williams, John R. (Inventor)

    2007-01-01

    A graded junction termination extension in a silicon carbide (SiC) semiconductor device and method of its fabrication using ion implementation techniques is provided for high power devices. The properties of silicon carbide (SiC) make this wide band gap semiconductor a promising material for high power devices. This potential is demonstrated in various devices such as p-n diodes, Schottky diodes, bipolar junction transistors, thyristors, etc. These devices require adequate and affordable termination techniques to reduce leakage current and increase breakdown voltage in order to maximize power handling capabilities. The graded junction termination extension disclosed is effective, self-aligned, and simplifies the implementation process.

  12. Graded junction termination extensions for electronic devices

    NASA Technical Reports Server (NTRS)

    Merrett, J. Neil (Inventor); Isaacs-Smith, Tamara (Inventor); Sheridan, David C. (Inventor); Williams, John R. (Inventor)

    2006-01-01

    A graded junction termination extension in a silicon carbide (SiC) semiconductor device and method of its fabrication using ion implementation techniques is provided for high power devices. The properties of silicon carbide (SiC) make this wide band gap semiconductor a promising material for high power devices. This potential is demonstrated in various devices such as p-n diodes, Schottky diodes, bipolar junction transistors, thyristors, etc. These devices require adequate and affordable termination techniques to reduce leakage current and increase breakdown voltage in order to maximize power handling capabilities. The graded junction termination extension disclosed is effective, self-aligned, and simplifies the implementation process.

  13. Resonant plasmonic terahertz detection in graphene split-gate field-effect transistors with lateral p–n junctions

    NASA Astrophysics Data System (ADS)

    Ryzhii, V.; Ryzhii, M.; Shur, M. S.; Mitin, V.; Satou, A.; Otsuji, T.

    2016-08-01

    We evaluate the proposed resonant terahertz (THz) detectors on the basis of field-effect transistors (FETs) with split gates, electrically induced lateral p–n junctions, uniform graphene layer (GL) or perforated (in the p–n junction depletion region) graphene layer (PGL) channel. The perforated depletion region forms an array of the nanoconstions or nanoribbons creating the barriers for the holes and electrons. The operation of the GL-FET- and PGL-FET-detectors is associated with the rectification of the ac current across the lateral p–n junction enhanced by the excitation of bound plasmonic oscillations in the p- and n-sections of the channel. Using the developed device model, we find the GL-FET- and PGL-FET-detector characteristics. These detectors can exhibit very high voltage responsivity at the THz radiation frequencies close to the frequencies of the plasmonic resonances. These frequencies can be effectively voltage tuned. We show that in PL-FET-detectors the dominant mechanism of the current rectification is due to the tunneling nonlinearity, whereas in the PGL-FET-detector the current rectification is primarily associated with the thermionic processes. Due to much lower p–n junction conductance in the PGL-FET-detectors, their resonant response can be substantially more pronounced than in the GL-FET-detectors corresponding to fairly high detector responsivity.

  14. A dc model for power switching transistors suitable for computer-aided design and analysis

    NASA Technical Reports Server (NTRS)

    Wilson, P. M.; George, R. T., Jr.; Owen, H. A.; Wilson, T. G.

    1979-01-01

    A model for bipolar junction power switching transistors whose parameters can be readily obtained by the circuit design engineer, and which can be conveniently incorporated into standard computer-based circuit analysis programs is presented. This formulation results from measurements which may be made with standard laboratory equipment. Measurement procedures, as well as a comparison between actual and computed results, are presented.

  15. A dc model for power switching transistors suitable for computer-aided design and analysis

    NASA Technical Reports Server (NTRS)

    Wilson, P. M.; George, R. T., Jr.; Owen, H. A., Jr.; Wilson, T. G.

    1979-01-01

    The proposed dc model for bipolar junction power switching transistors is based on measurements which may be made with standard laboratory equipment. Those nonlinearities which are of importance to power electronics design are emphasized. Measurements procedures are discussed in detail. A model formulation adapted for use with a computer program is presented, and a comparison between actual and computer-generated results is made.

  16. Superconducting transistor

    DOEpatents

    Gray, Kenneth E.

    1979-01-01

    A superconducting transistor is formed by disposing three thin films of superconducting material in a planar parallel arrangement and insulating the films from each other by layers of insulating oxides to form two tunnel junctions. One junction is biased above twice the superconducting energy gap and the other is biased at less than twice the superconducting energy gap. Injection of quasiparticles into the center film by one junction provides a current gain in the second junction.

  17. On the Emitter Resistance of High-Performance GaAs- and InP-Based Heterojunction Bipolar Transistors

    NASA Astrophysics Data System (ADS)

    Matsuoka, Yutaka; Ohkubo, Yukio; Matsumoto, Taisuke; Koji, Takashi; Amano, Yoshiaki; Takagi, Akio

    2008-06-01

    Emitter resistance REE and collector current ideality factor nC of InGaP/GaAs heterostructure bipolar transistors (HBTs) and InP/InGaAs double-HBTs (DHBTs) were investigated from the viewpoints of DC and RF characteristics. It was found that the apparent ideality factor of collector current nCapp increases with the collector current IC for all HBTs. The increase in nCapp is more conspicuous in the InP/InGaAs DHBTs than in the InGaP/GaAs HBTs. The most likely explanation is that the REE consists of two components: one is the well-known contact resistivity REE0 and the other is band-profile-dependent resistivity REi, which decreases as IC increases. In the InP/InGaAs DHBTs, the increase in nCapp with IC is made remarkable by the insertion of an InGaAs etching stop layer (ESL) that makes it easy to form a ledge structure indispensable for high-reliability and high-performance HBTs. However, with the increase of IC, the difference in REE between the InP/InGaAs DHBTs with and without the ESL becomes small. The insertion of an ESL is considered acceptable for high-speed IC applications. Using an emitter structure with an ESL, we developed self-aligned InP/InGaAs DHBTs with a ledge passivation structure that attained an fT of 302 GHz, fmax of 388 GHz, and BVCEO of 6.2 V.

  18. Collector-up aluminum gallium arsenide/gallium arsenide heterojunction bipolar transistors using oxidized aluminum arsenide for current confinement

    NASA Astrophysics Data System (ADS)

    Massengale, Alan Ross

    1998-12-01

    The discovery in 1990 that the wet thermal oxidation of AlAs can create a stable native oxide has added a new constituent, AlAs-oxide, to the AlGaAs/GaAs materials system. Native oxides of high Al mole-fraction AlGaAs are being used to confine electrical and/or optical fields in many types of electronic and optoelectronic structures with very promising results. Among these devices are collector-up heterojunction bipolar transistors (HBTs). Collector-up HBTs offer a means to reduce base-collector capacitance relative to their emitter-up counterparts, and thus to improve device performance. A novel method for fabricating collector-up AlGaAs/GaAs HBTs where an AlAs layer is inserted into the emitter layer and is oxidized in water vapor at 450sp°C has been developed. The resulting AlAs-oxide serves as a current confining layer that constricts collector current flow to the intrinsic portion of the device. Compared to previous methods of fabricating these devices, the process of converting AlAs into an insulator requires only one growth, and does not suffer from implant damage in the base. Because the lateral oxidation of AlAs is a process that proceeds at rates of microns per minute, one of the major challenges facing its implementation is the ability to accurately control the oxidation rate over the wafer, and from one wafer to the next. In the course of work on the oxidation of AlAs, a method to lithographically form lateral oxidation stop layers has been achieved. This technique utilizes impurity induced layer disordering (IILD) in heavily Si-doped buried planes, combined with selective surface patterning and thermal annealing, to create a lateral variation in the Al mole-fraction of the layer to be oxidized.

  19. Compact model for non-local avalanche effect in advanced bipolar transistors: An assessment of the relaxation length and its temperature dependence

    NASA Astrophysics Data System (ADS)

    Setekera, Robert; van der Toorn, Ramses

    2016-05-01

    We present a physics based compact model formulation for non-local avalanche effects. It is explicit and in terms of elementary functions, hence suitable for implementation in existing compact transistor models. The formulation has only two material coefficients as parameters: the energy relaxation length and its temperature coefficient. We present a detailed verification of our model against measured avalanche characteristics, as a function of both bias and temperature, for Si and SiGe industrial bipolar transistors. We demonstrate that the model is complete and accurate enough for the parameter extraction to be taken as an in situ measurement for both the electron energy relaxation length and its temperature coefficient: values obtained correspond to the values published earlier in the semiconductor literature.

  20. Effect of Si interface surface roughness to the tunneling current of the Si/Si1-xGex/Si heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Hasanah, Lilik; Suhendi, Endi; Tayubi, Yuyu Rahmat; Yuwono, Heru; Nandiyanto, Asep Bayu Dani; Murakami, Hideki; Khairrurijal

    2016-02-01

    In this work we discuss the surface roughness of Si interface impact to the tunneling current of the Si/Si1-xGex/Si heterojunction bipolar transistor. The Si interface surface roughness can be analyzed from electrical characteristics through the transversal electron velocity obtained as fitting parameter factor. The results showed that surface roughness increase as Ge content of virtual substrate increase This model can be used to investigate the effect of Ge content of the virtual substrate to the interface surface condition through current-voltage characteristic.

  1. Heavy-ion broad-beam and microprobe studies of single-event upsets in 0.20 um SiGe heterojunction bipolar transistors and circuits.

    SciTech Connect

    Fritz, Karl; Irwin, Timothy J.; Niu, Guofu; Fodness, Bryan; Carts, Martin A.; Marshall, Paul W.; Reed, Robert A.; Gilbert, Barry; Randall, Barbara; Prairie, Jason; Riggs, Pam; Pickel, James C.; LaBel, Kenneth; Cressler, John D.; Krithivasan, Ramkumar; Dodd, Paul Emerson; Vizkelethy, Gyorgy

    2003-09-01

    Combining broad-beam circuit level single-event upset (SEU) response with heavy ion microprobe charge collection measurements on single silicon-germanium heterojunction bipolar transistors improves understanding of the charge collection mechanisms responsible for SEU response of digital SiGe HBT technology. This new understanding of the SEU mechanisms shows that the right rectangular parallele-piped model for the sensitive volume is not applicable to this technology. A new first-order physical model is proposed and calibrated with moderate success.

  2. Evaluation and Control of Break-Even Time of Nonvolatile Static Random Access Memory Based on Spin-Transistor Architecture with Spin-Transfer-Torque Magnetic Tunnel Junctions

    NASA Astrophysics Data System (ADS)

    Shuto, Yusuke; Yamamoto, Shuu'ichirou; Sugahara, Satoshi

    2012-04-01

    The energy performance of a nonvolatile static random access memory (NV-SRAM) cell for power gating applications was quantitatively analyzed for the first time using the performance index of break-even time (BET). The NV-SRAM cell is based on spin-transistor architecture using ordinary metal-oxide-semiconductor field-effect transistors (MOSFETs) and spin-transfer-torque magnetic tunnel junctions (STT-MTJs), whose circuit representation of spin-transistor is referred to as a pseudo-spin-MOSFET (PS-MOSFET). The cell is configured with a standard six-transistor SRAM cell and two PS-MOSFETs. The NV-SRAM cell basically has a short BET of submicroseconds. Although the write (store) operation to the STT-MTJs causes an increase in the BET, it can be successfully reduced by the proposed power-aware bias-control for the PS-MOSFETs.

  3. Radiation effect on silicon transistors in mixed neutrons-gamma environment

    NASA Astrophysics Data System (ADS)

    Assaf, J.; Shweikani, R.; Ghazi, N.

    2014-10-01

    The effects of gamma and neutron irradiations on two different types of transistors, Junction Field Effect Transistor (JFET) and Bipolar Junction Transistor (BJT), were investigated. Irradiation was performed using a Syrian research reactor (RR) (Miniature Neutron Source Reactor (MNSR)) and a gamma source (Co-60 cell). For RR irradiation, MCNP code was used to calculate the absorbed dose received by the transistors. The experimental results showed an overall decrease in the gain factors of the transistors after irradiation, and the JFETs were more resistant to the effects of radiation than BJTs. The effect of RR irradiation was also greater than that of gamma source for the same dose, which could be because neutrons could cause more damage than gamma irradiation.

  4. Comparative passivation effects of self-assembled mono- and multilayers on GaAs junction field effect transistors

    NASA Astrophysics Data System (ADS)

    Lee, Kangho; Lu, Gang; Facchetti, Antonio; Janes, David B.; Marks, Tobin J.

    2008-03-01

    Control of semiconductor interface state density with molecular passivation is essential for developing conduction-based biosensors. In this study, GaAs junction field effect transistors (JFETs) are fabricated and characterized before and after passivation of the GaAs surface with self-assembled mono- and multilayers. The JFETs functionalized with 1-octadecanethiol monolayers and two types of self-assembled organic nanodielectric (SAND) multilayers exhibit significantly different threshold voltage (Vth) and subthreshold slope (Ssub) characteristics versus the unpassivated devices and provide useful information on the quality of the passivation. Two-dimensional device simulations quantify the effective density of fixed surface charges and interfacial traps and argue for the importance of the type-III SAND ionic charges in enhancing GaAs JFET response characteristics.

  5. Efficient light output power for InGaP/GaAs heterojunction bipolar transistors incorporated with InGaAs quantum wells

    NASA Astrophysics Data System (ADS)

    Huang, Tzu-Hsuan; Wu, Meng-Chyi

    2016-07-01

    In this work, the current gain and optical frequency response of the heterojunction bipolar transistor (HBT) and heterojunction bipolar light-emitting transistor (HBLET) are investigated. Compared to the conventional HBT, two-pair quantum wells are embedded in the base region of the HBLET. The current gain of HBLET increases with temperature, which shows dissimilar electrical properties to the HBT. Although the current gain of HBLET is much smaller than that of HBT, the decrement of current gain is converted to enhance the light output power. The light output power of HBLET can reach 0.96 mW at 90 mA. The HBLET exhibits the 3-dB bandwidths (f3dB) of 554 and 559 MHz at 30 and 50 mA, respectively. It is found that the 3-dB frequency is proportional to the square root of base current density, while the minority carrier lifetime is inversely proportional to the square root of base current density. Therefore, our results suggest that HBLET with the high light output power shows a great potential in the short range optical data communications.

  6. Black Phosphorus-Zinc Oxide Nanomaterial Heterojunction for p-n Diode and Junction Field-Effect Transistor.

    PubMed

    Jeon, Pyo Jin; Lee, Young Tack; Lim, June Yeong; Kim, Jin Sung; Hwang, Do Kyung; Im, Seongil

    2016-02-10

    Black phosphorus (BP) nanosheet is two-dimensional (2D) semiconductor with distinct band gap and attracting recent attention from researches because it has some similarity to gapless 2D semiconductor graphene in the following two aspects: single element (P) for its composition and quite high mobilities depending on its fabrication conditions. Apart from several electronic applications reported with BP nanosheet, here we report for the first time BP nanosheet-ZnO nanowire 2D-1D heterojunction applications for p-n diodes and BP-gated junction field effect transistors (JFETs) with n-ZnO channel on glass. For these nanodevices, we take advantages of the mechanical flexibility of p-type conducting of BP and van der Waals junction interface between BP and ZnO. As a result, our BP-ZnO nanodimension p-n diode displays a high ON/OFF ratio of ∼10(4) in static rectification and shows kilohertz dynamic rectification as well while ZnO nanowire channel JFET operations are nicely demonstrated by BP gate switching in both electrostatics and kilohertz dynamics. PMID:26771206

  7. Method and apparatus for increasing resistance of bipolar buried layer integrated circuit devices to single-event upsets

    NASA Technical Reports Server (NTRS)

    Zoutendyk, John A. (Inventor)

    1991-01-01

    Bipolar transistors fabricated in separate buried layers of an integrated circuit chip are electrically isolated with a built-in potential barrier established by doping the buried layer with a polarity opposite doping in the chip substrate. To increase the resistance of the bipolar transistors to single-event upsets due to ionized particle radiation, the substrate is biased relative to the buried layer with an external bias voltage selected to offset the built-in potential just enough (typically between about +0.1 to +0.2 volt) to prevent an accumulation of charge in the buried-layer-substrate junction.

  8. Progress Towards High-Sensitivity Arrays of Detectors of Sub-mm Radiation Using Superconducting Tunnel Junctions with Integrated Radio Frequency Single-Electron Transistors

    NASA Technical Reports Server (NTRS)

    Stevenson, T. R.; Hsieh, W.-T.; Li, M. J.; Prober, D. E.; Rhee, K. W.; Schoelkopf, R. J.; Stahle, C. M.; Teufel, J.; Wollack, E. J.

    2004-01-01

    For high resolution imaging and spectroscopy in the FIR and submillimeter, space observatories will demand sensitive, fast, compact, low-power detector arrays with 104 pixels and sensitivity less than 10(exp -20) W/Hz(sup 0.5). Antenna-coupled superconducting tunnel junctions with integrated rf single-electron transistor readout amplifiers have the potential for achieving this high level of sensitivity, and can take advantage of an rf multiplexing technique. The device consists of an antenna to couple radiation into a small superconducting volume and cause quasiparticle excitations, and a single-electron transistor to measure current through junctions contacting the absorber. We describe optimization of device parameters, and results on fabrication techniques for producing devices with high yield for detector arrays. We also present modeling of expected saturation power levels, antenna coupling, and rf multiplexing schemes.

  9. Normal metal tunnel junction-based superconducting quantum interference proximity transistor

    SciTech Connect

    D'Ambrosio, Sophie Meissner, Martin; Blanc, Christophe; Ronzani, Alberto; Giazotto, Francesco

    2015-09-14

    We report the fabrication and characterization of an alternative design for a superconducting quantum interference proximity transistor (SQUIPT) based on a normal metal (N) probe. The absence of direct Josephson coupling between the proximized metal nanowire and the N probe allows us to observe the full modulation of the wire density of states around zero voltage and current via the application of an external magnetic field. This results into a drastic suppression of power dissipation which can be as low as a few ∼10{sup −17} W. In this context, the interferometer allows an improvement of up to four orders of magnitude with respect to earlier SQUIPT designs and makes it ideal for extra-low power cryogenic applications. In addition, the N-SQUIPT has been recently predicted to be the enabling candidate for the implementation of coherent caloritronic devices based on proximity effect.

  10. NpN-GaN/InxGa1-xN/GaN heterojunction bipolar transistor on free-standing GaN substrate

    NASA Astrophysics Data System (ADS)

    Lochner, Zachary; Jin Kim, Hee; Lee, Yi-Che; Zhang, Yun; Choi, Suk; Shen, Shyh-Chiang; Doug Yoder, P.; Ryou, Jae-Hyun; Dupuis, Russell D.

    2011-11-01

    Data and analysis are presented for NpN-GaN/InGaN/GaN double-heterojunction bipolar transistors (HBTs) grown and fabricated on a free-standing GaN (FS-GaN) substrate in comparison to that on a sapphire substrate to investigate the effect of dislocations in III-nitride HBT epitaxial structures. The performance characteristics of HBTs on FS-GaN exhibit a maximum collector current density of ˜12.3 kA/cm2, dc current gain of ˜90, and maximum differential gain of ˜120 without surface passivation, representing a substantial improvement over similar devices grown on sapphire. This is attributed to the reduction in threading dislocation density afforded by using a homoepitaxial growth on a high-crystalline-quality substrate. The minority carrier diffusion length increases significantly owing to not only a mitigated carrier trap effect via fewer dislocations, but also possibly reduced microscopic localized states.

  11. Numerical investigation of temperature field Induced by dual wavelength lasers in sub-microsecond laser annealing technology for insulated gate bipolar transistor

    NASA Astrophysics Data System (ADS)

    Cui, GuoDong; Ma, Mingying; Wang, Fan; Sun, Gang; Lan, Yanping; Xu, Wen

    2015-07-01

    To enhance the performance of the Insulated Gate Bipolar Transistor (IGBT), sub-microsecond laser annealing (LA) is propitious to achieve maximal dopant activation with minimal diffusion. In this work, two different lasers are used as annealing resource: a continuous 808 nm laser with larger spot is applied to preheat the wafer and another sub-microsecond pulsed 527 nm laser is responsible to activate the dopant. To optimize the system's performance, a physical model is presented to predict the thermal effect of two laser fields interacting on wafer. Using the Finite-Element method (FEM), we numerically investigate the temperature field induced by lasers in detail. The process window corresponding to the lasers is also acquired which can satisfy the requirements of the IGBT's annealing.

  12. Switching characteristics of a 4H-SiC insulated-gate bipolar transistor with interface defects up to the nonquasi-static regime

    NASA Astrophysics Data System (ADS)

    Pesic, Iliya; Navarro, Dondee; Fujinaga, Masato; Furui, Yoshiharu; Miura-Mattausch, Mitiko

    2015-04-01

    The switching characteristics of a trench-type 4H-SiC insulated-gate bipolar transistor (IGBT) device with interface defects are analyzed up to the nonquasi-static (NQS) switching regime using reported interface density measurements and device simulation. Collector current degradation characterized by threshold voltage shift to higher gate voltages and reduction of current magnitude due to carrier trapping are observed under quasi-static (QS) simulation condition. At slow switching of the gate voltage, carrier trapping causes a hump in the transient current at the start of conduction. At very fast switching, the current hump is limited by the NQS effect which results to a reduced switching efficiency and increased on-resistance.

  13. Investigation of 4H-SiC insulated-gate bipolar transistor turn-off performance for achieving low power loss

    NASA Astrophysics Data System (ADS)

    Navarro, Dondee; Pesic, Iliya; Morikawa, Yoji; Furui, Yoshiharu; Miura-Mattausch, Mitiko

    2016-04-01

    The dynamic characteristics of a 4H-SiC insulated-gate bipolar transistor (IGBT) at pulse switching is investigated by incorporating reported measurements of the interface defect density to device simulation. Different trap features such as energy states and trap time constants are investigated to determine the influence of traps on circuit performance. The capture cross-section parameter used in the simulation depicts the probability of traps to trap/detrap carriers which relates to the carrier trap time constant. It is demonstrated that trapped carriers from the on-state condition cause enhanced generation current during the off-state condition, which give rise to undesired leakage current in addition to the threshold voltage shift previously reported. The device power dissipation is increased by a factor of 100 due to the defects.

  14. On the AlGaInP-bulk and AlGaInP/GaAs-superlattice confinement effects for heterostructure-emitter bipolar transistors

    SciTech Connect

    Tsai, Jung-Hui

    2015-02-09

    The confinement effect and electrical characteristics of heterostructure-emitter bipolar transistors with an AlGaInP bulk-confinement layer and an AlGaInP/GaAs superlattice-confinement layer are first demonstrated and compared by experimentally results. In the two devices, the relatively large valence band discontinuity at AlGaInP/GaAs heterojunction provides excellent confinement effect for holes to enhance current gain. As to the AlGaInP/GaAs superlattice-confinement device, part of thermionic-emission electrons will be trapped in the GaAs quantum wells of the superlattice. This will result in lower collector current and current gain as compared with the bulk-confinement device. Nevertheless, the superlattice-confinement device exhibits a larger current-gain cutoff frequency, which can be attributed that the tunneling behavior is included in the carrier transportation and transporting time across the emitter region could be substantially reduced.

  15. Plasma Separation Process: Betacell (BCELL) code: User's manual. [Bipolar barrier junction

    SciTech Connect

    Taherzadeh, M.

    1987-11-13

    The emergence of clearly defined applications for (small or large) amounts of long-life and reliable power sources has given the design and production of betavoltaic systems a new life. Moreover, because of the availability of the plasma separation program, (PSP) at TRW, it is now possible to separate the most desirable radioisotopes for betacell power generating devices. A computer code, named BCELL, has been developed to model the betavoltaic concept by utilizing the available up-to-date source/cell parameters. In this program, attempts have been made to determine the betacell energy device maximum efficiency, degradation due to the emitting source radiation and source/cell lifetime power reduction processes. Additionally, comparison is made between the Schottky and PN junction devices for betacell battery design purposes. Certain computer code runs have been made to determine the JV distribution function and the upper limit of the betacell generated power for specified energy sources. A Ni beta emitting radioisotope was used for the energy source and certain semiconductors were used for the converter subsystem of the betacell system. Some results for a Promethium source are also given here for comparison. 16 refs.

  16. Optically Induced PN Junction Diode and Photovoltaic Response on Ambipolar MoSe2 Field-effect Transistor

    NASA Astrophysics Data System (ADS)

    Pradhan, Nihar; Lu, Zhengguang; Rhodes, Daniel; Terrones, Mauricio; Smirnov, Dmitry; Balicas, Luis

    2015-03-01

    Transition metal dichalcogenides (TMDs) have emerged as an attractive material for electronic and optoelectronic devices due to their sizable band gap, flexibility and reduced dimensionality, which makes them promising candidates for applications in translucent optoelectronics components, such as solar cells and light emitting diodes. Here, we present an optically induced diode like response and concomitant photovoltaic effect in few-atomic layers molybdenum diselenide (MoSe2) field-effect transistors. Compared to recently reported PN junctions based on TMDs, ambipolar MoSe2 shows nearly ideal diode rectification under illumination, with a sizable photovoltaic efficiency. The observed light induced diode response under fixed gate voltage, yields a maximum open circuit voltage 0.28V and short circuit current 230nA at 30uW incident laser power. The sense of current rectification can be altered by changing the polarity of the applied gate voltage (Vbg) . At Vbg = 0V the highest electrical power obtained is 175pW corresponding to a maximum photovoltaic efficiency of 0.01%. These values increased to 11nW and 0.05% under a Vbg = -7.5V. At an excitation voltage 1V we observed maximum photocurrent responsivity surpassing 100mA/W with corresponding external quantum efficiency ~ 30%.

  17. Electrical detection of the biological interaction of a charged peptide via gallium arsenide junction-field-effect transistors

    NASA Astrophysics Data System (ADS)

    Lee, Kangho; Nair, Pradeep R.; Alam, Muhammad A.; Janes, David B.; Wampler, Heeyeon P.; Zemlyanov, Dmitry Y.; Ivanisevic, Albena

    2008-06-01

    GaAs junction-field-effect transistors (JFETs) are utilized to achieve label-free detection of biological interaction between a probe transactivating transcriptional activator (TAT) peptide and the target trans-activation-responsive (TAR) RNA. The TAT peptide is a short sequence derived from the human immunodeficiency virus-type 1 TAT protein. The GaAs JFETs are modified with a mixed adlayer of 1-octadecanethiol (ODT) and TAT peptide, with the ODT passivating the GaAs surface from polar ions in physiological solutions and the TAT peptide providing selective binding sites for TAR RNA. The devices modified with the mixed adlayer exhibit a negative pinch-off voltage (VP) shift, which is attributed to the fixed positive charges from the arginine-rich regions in the TAT peptide. Immersing the modified devices into a TAR RNA solution results in a large positive VP shift (>1 V) and a steeper subthreshold slope (˜80 mV/decade), whereas "dummy" RNA induced a small positive VP shift (˜0.3 V) without a significant change in subthreshold slopes (˜330 mV/decade). The observed modulation of device characteristics is analyzed with analytical modeling and two-dimensional numerical device simulations to investigate the electronic interactions between the GaAs JFETs and biological molecules.

  18. Electrical detection of the biological interaction of a charged peptide via gallium arsenide junction-field-effect transistors

    PubMed Central

    Lee, Kangho; Nair, Pradeep R.; Alam, Muhammad A.; Janes, David B.; Wampler, Heeyeon P.; Zemlyanov, Dmitry Y.; Ivanisevic, Albena

    2008-01-01

    GaAs junction-field-effect transistors (JFETs) are utilized to achieve label-free detection of biological interaction between a probe transactivating transcriptional activator (TAT) peptide and the target trans-activation-responsive (TAR) RNA. The TAT peptide is a short sequence derived from the human immunodeficiency virus-type 1 TAT protein. The GaAs JFETs are modified with a mixed adlayer of 1-octadecanethiol (ODT) and TAT peptide, with the ODT passivating the GaAs surface from polar ions in physiological solutions and the TAT peptide providing selective binding sites for TAR RNA. The devices modified with the mixed adlayer exhibit a negative pinch-off voltage (VP) shift, which is attributed to the fixed positive charges from the arginine-rich regions in the TAT peptide. Immersing the modified devices into a TAR RNA solution results in a large positive VP shift (>1 V) and a steeper subthreshold slope (∼80 mV∕decade), whereas “dummy” RNA induced a small positive VP shift (∼0.3 V) without a significant change in subthreshold slopes (∼330 mV∕decade). The observed modulation of device characteristics is analyzed with analytical modeling and two-dimensional numerical device simulations to investigate the electronic interactions between the GaAs JFETs and biological molecules. PMID:19484151

  19. Stability Diagrams of Single-Common-Gate Double-Dot Single-Electron Transistors with Arbitrary Junction and Gate Capacitances

    NASA Astrophysics Data System (ADS)

    Imai, Shigeru; Kato, Hiroki; Hiraoka, Yasuhiro

    2012-12-01

    Stability diagrams of single-common-gate double-dot single-electron transistors are drawn in the Vg-V plane using the exact formulas that represent Coulomb blockade conditions, where the gate, source, and drain voltages are Vg, -V/2, and V/2, respectively. The stability regions are arranged along the Vg axis with no overlap. If gate capacitances Cg1 and Cg2 satisfy Cg1/m1 = Cg2/m2 = C0, the stability diagram is periodic with the period of e/C0 along the Vg axis, where m1 and m2 are natural numbers prime to each other. The stability diagram is point-symmetrical with respect to the point (me/2C0, 0) for all integers m. If Vg increases at V = 0, electrons are transferred into the islands under a rule, which can be explained in terms of periodicity and symmetry. The detailed features are described for the cases of uniform gate capacitances and uniform junction capacitances.

  20. Determination of lifetimes and recombination currents in p-n junction solar cells, diodes, and transistors

    NASA Technical Reports Server (NTRS)

    Neugroschel, A.

    1981-01-01

    New methods are presented and illustrated that enable the accurate determination of the diffusion length of minority carriers in the narrow regions of a solar cell or a diode. Other methods now available are inaccurate for the desired case in which the width of the region is less than the diffusion length. Once the diffusion length is determined by the new methods, this result can be combined with measured dark I-V characteristics and with small-signal admittance characteristics to enable determination of the recombination currents in each quasi-neutral region of the cell - for example, in the emitter, low-doped base, and high-doped base regions of the BSF (back-surface-field) cell. This approach leads to values for the effective surface recombination velocity of the high-low junction forming the back-surface field of BSF cells or the high-low emitter junction of HLE cells. These methods are also applicable for measuring the minority-carrier lifetime in thin epitaxial layers grown on substrates with opposite conductivity type.

  1. Analysis of different tunneling mechanisms of In{sub x}Ga{sub 1−x}As/AlGaAs tunnel junction light-emitting transistors

    SciTech Connect

    Wu, Cheng-Han; Wu, Chao-Hsin

    2014-10-27

    The electrical and optical characteristics of tunnel junction light-emitting transistors (TJLETs) with different indium mole fractions (x = 5% and 2.5%) of the In{sub x}Ga{sub 1−x}As base-collector tunnel junctions have been investigated. Two electron tunneling mechanisms (photon-assisted or direct tunneling) provide additional currents to electrical output and resupply holes back to the base region, resulting in the upward slope of I-V curves and enhanced optical output under forward-active operation. The larger direct tunneling probability and stronger Franz-Keldysh absorption for 5% TJLET lead to higher collector current slope and less optical intensity enhancement when base-collector junction is under reverse-biased.

  2. Oxide bipolar electronics: materials, devices and circuits

    NASA Astrophysics Data System (ADS)

    Grundmann, Marius; Klüpfel, Fabian; Karsthof, Robert; Schlupp, Peter; Schein, Friedrich-Leonhard; Splith, Daniel; Yang, Chang; Bitter, Sofie; von Wenckstern, Holger

    2016-06-01

    We present the history of, and the latest progress in, the field of bipolar oxide thin film devices. As such we consider primarily pn-junctions in which at least one of the materials is a metal oxide semiconductor. A wide range of n-type and p-type oxides has been explored for the formation of such bipolar diodes. Since most oxide semiconductors are unipolar, challenges and opportunities exist with regard to the formation of heterojunction diodes and band lineups. Recently, various approaches have led to devices with high rectification, namely p-type ZnCo2O4 and NiO on n-type ZnO and amorphous zinc-tin-oxide. Subsequent bipolar devices and applications such as photodetectors, solar cells, junction field-effect transistors and integrated circuits like inverters and ring oscillators are discussed. The tremendous progress shows that bipolar oxide electronics has evolved from the exploration of various materials and heterostructures to the demonstration of functioning integrated circuits. Therefore a viable, facile and high performance technology is ready for further exploitation and performance optimization.

  3. Static and switching characteristics of 3.3 kV double channel-doped SiC vertical junction field effect transistor in cascode configuration

    NASA Astrophysics Data System (ADS)

    Shimizu, Haruka; Akiyama, Satoru; Yokoyama, Natsuki; Shima, Akio; Shimamoto, Yasuhiro

    2015-04-01

    A silicon-carbide (SiC) junction field-effect transistor (JFET)/Si metal-oxide-semiconductor field-effect transistor (MOSFET) cascode is a good solution owing to its high reliability, low on-resistance, high switching speed, and good gate controllability. A 3.3 kV SiC vertical JFET using a double channel doping technique is proposed in this paper. The characteristics of a cascode including the developed JFET are also presented. A blocking voltage higher than 4.0 kV and a low on-resistance of 14.7 mΩ cm2 were realized. The saturation current of the cascode was suppressed by controlling the threshold voltage of the JFET. Moreover, small switching losses were obtained.

  4. Modeling Low-Dose-Rate Effects in Irradiated Bipolar-Base Oxides

    SciTech Connect

    Cirba, C.R.; Fleetwood, D.M.; Graves, R.J.; Michez, A.; Milanowski, R.J.; Saigne, F.; Schrimpf, R.D.; Witczak, S.C.

    1998-10-26

    A physical model is developed to quantify the contribution of oxide-trapped charge to enhanced low-dose-rate gain degradation in bipolar junction transistors. Multiple-trapping simulations show that space charge limited transport is partially responsible for low-dose-rate enhancement. At low dose rates, more holes are trapped near the silicon-oxide interface than at high dose rates, resulting in larger midgap voltage shifts at lower dose rates. The additional trapped charge near the interface may cause an exponential increase in excess base current, and a resultant decrease in current gain for some NPN bipolar technologies.

  5. High Accuracy Transistor Compact Model Calibrations

    SciTech Connect

    Hembree, Charles E.; Mar, Alan; Robertson, Perry J.

    2015-09-01

    Typically, transistors are modeled by the application of calibrated nominal and range models. These models consists of differing parameter values that describe the location and the upper and lower limits of a distribution of some transistor characteristic such as current capacity. Correspond- ingly, when using this approach, high degrees of accuracy of the transistor models are not expected since the set of models is a surrogate for a statistical description of the devices. The use of these types of models describes expected performances considering the extremes of process or transistor deviations. In contrast, circuits that have very stringent accuracy requirements require modeling techniques with higher accuracy. Since these accurate models have low error in transistor descriptions, these models can be used to describe part to part variations as well as an accurate description of a single circuit instance. Thus, models that meet these stipulations also enable the calculation of quantifi- cation of margins with respect to a functional threshold and uncertainties in these margins. Given this need, new model high accuracy calibration techniques for bipolar junction transis- tors have been developed and are described in this report.

  6. A silicon nanocrystal tunnel field effect transistor

    SciTech Connect

    Harvey-Collard, Patrick; Drouin, Dominique; Pioro-Ladrière, Michel

    2014-05-12

    In this work, we demonstrate a silicon nanocrystal Field Effect Transistor (ncFET). Its operation is similar to that of a Tunnelling Field Effect Transistor (TFET) with two barriers in series. The tunnelling barriers are fabricated in very thin silicon dioxide and the channel in intrinsic polycrystalline silicon. The absence of doping eliminates the problem of achieving sharp doping profiles at the junctions, which has proven a challenge for large-scale integration and, in principle, allows scaling down the atomic level. The demonstrated ncFET features a 10{sup 4} on/off current ratio at room temperature, a low 30 pA/μm leakage current at a 0.5 V bias, an on-state current on a par with typical all-Si TFETs and bipolar operation with high symmetry. Quantum dot transport spectroscopy is used to assess the band structure and energy levels of the silicon island.

  7. Characterization of vertical GaN p-n diodes and junction field-effect transistors on bulk GaN down to cryogenic temperatures

    NASA Astrophysics Data System (ADS)

    Kizilyalli, I. C.; Aktas, O.

    2015-12-01

    There is great interest in wide-bandgap semiconductor devices and most recently in vertical GaN structures for power electronic applications such as power supplies, solar inverters and motor drives. In this paper the temperature-dependent electrical behavior of vertical GaN p-n diodes and vertical junction field-effect transistors fabricated on bulk GaN substrates of low defect density (104 to 106 cm-2) is described. Homoepitaxial MOCVD growth of GaN on its native substrate and the ability to control the doping in the drift layers in GaN have allowed the realization of vertical device architectures with drift layer thicknesses of 6 to 40 μm and net carrier electron concentrations as low as 1 × 1015 cm-3. This parameter range is suitable for applications requiring breakdown voltages of 1.2 kV to 5 kV. Mg, which is used as a p-type dopant in GaN, is a relatively deep acceptor (E A ≈ 0.18 eV) and susceptible to freeze-out at temperatures below 200 K. The loss of holes in p-GaN has a deleterious effect on p-n junction behavior, p-GaN contacts and channel control in junction field-effect transistors at temperatures below 200 K. Impact ionization-based avalanche breakdown (BV > 1200 V) in GaN p-n junctions is characterized between 77 K and 423 K for the first time. At higher temperatures the p-n junction breakdown voltage improves due to increased phonon scattering. A positive temperature coefficient in the breakdown voltage is demonstrated down to 77 K; however, the device breakdown characteristics are not as abrupt at temperatures below 200 K. On the other hand, contact resistance to p-GaN is reduced dramatically above room temperature, improving the overall device performance in GaN p-n diodes in all cases except where the n-type drift region resistance dominates the total forward resistance. In this case, the electron mobility can be deconvolved and is found to decrease with T -3/2, consistent with a phonon scattering model. Also, normally-on vertical junction

  8. A G-band terahertz monolithic integrated amplifier in 0.5-μm InP double heterojunction bipolar transistor technology

    NASA Astrophysics Data System (ADS)

    Ou-Peng, Li; Yong, Zhang; Rui-Min, Xu; Wei, Cheng; Yuan, Wang; Bing, Niu; Hai-Yan, Lu

    2016-05-01

    Design and characterization of a G-band (140–220 GHz) terahertz monolithic integrated circuit (TMIC) amplifier in eight-stage common-emitter topology are performed based on the 0.5-μm InGaAs/InP double heterojunction bipolar transistor (DHBT). An inverted microstrip line is implemented to avoid a parasitic mode between the ground plane and the InP substrate. The on-wafer measurement results show that peak gains are 20 dB at 140 GHz and more than 15-dB gain at 140–190 GHz respectively. The saturation output powers are ‑2.688 dBm at 210 GHz and ‑2.88 dBm at 220 GHz, respectively. It is the first report on an amplifier operating at the G-band based on 0.5-μm InP DHBT technology. Compared with the hybrid integrated circuit of vacuum electronic devices, the monolithic integrated circuit has the advantage of reliability and consistency. This TMIC demonstrates the feasibility of the 0.5-μm InGaAs/InP DHBT amplifier in G-band frequencies applications. Project supported by the National Natural Science Foundation of China (Grant No. 61501091) and the Fundamental Research Funds for the Central Universities of Ministry of Education of China (Grant Nos. ZYGX2014J003 and ZYGX2013J020).

  9. Device characteristics of the PnP AlGaAs/InGaAsN/GaAs double heterojunction bipolar transistor

    SciTech Connect

    CHANG,PING-CHIH; LI,N.Y.; LAROCHE,J.R.; BACA,ALBERT G.; HOU,H.Q.; REN,F.

    2000-02-09

    The authors have demonstrated a functional PnP double heterojunction bipolar transistor (DHBT) using AlGaAs, InGaAsN, and GaAs. The band alignment between InGaAsN and GaAs has a large {triangle}E{sub C} and a negligible {triangle}E{sub V}, and this unique characteristic is very suitable for PnP DHBT applications. The metalorganic vapor phase epitaxy (MOCVD) grown Al{sub 0.3}Ga{sub 0.7}As/In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01}/GaAs PnP DHBT is lattice matched to GaAs and has a peak current gain of 25. Because of the smaller bandgap (Eg = 1.20 eV) of In{sub 0.03}Ga{sub 0.97}As{sub 0.99}N{sub 0.01} used for the base layer, this device has a low V{sub ON} of 0.79 V, which is 0.25 V lower than in a comparable Pnp AlGaAs/GaAs HBT. And because GaAs is used for the collector, its BV{sub CEO} is 12 V, consistent with BV{sub CEO} of AlGaAs/GaAs HBTs of comparable collector thickness and doping level.

  10. An investigation of the effect of graded layers and tunneling on the performance of AlGaAs/GaAs heterojunction bipolar transistors

    NASA Astrophysics Data System (ADS)

    Grinberg, A. A.; Shur, M. S.; Fischer, R. J.; Morkoc, H.

    1984-12-01

    Results of theoretical and experimental studies of the heterojunction bipolar transistor are presented. The calculations are based on a new thermionic field-diffusion model which takes into account the dependence of the emitter efficiency on the height of the interface conduction band spike and tunneling across the spike. Based on this theory, analytical expressions are derived for the current-voltage characteristics, and the short-circuit common emitter current gain is related to the material parameters, doping levels, grading length, and device temperature. It is demonstrated that the thermoemission transport across the interface spike limits the rate of increase in the collector current with the emitter-base voltage and, as a consequence, the maximum common emitter current gain. Tunneling also plays an important role, especially for abrupt heterojunctions. The calculations reveal an important role played by grading of the composition of the emitter region in the vicinity of the heterointerface. Such grading decreases the barrier height at the interface and greatly enhances the emitter injection efficiency.

  11. Epitaxial growth and characterization of thick multi-layer 4H-SiC for very high-voltage insulated gate bipolar transistors

    NASA Astrophysics Data System (ADS)

    Miyazawa, Tetsuya; Nakayama, Koji; Tanaka, Atsushi; Asano, Katsunori; Ji, Shi-yang; Kojima, Kazutoshi; Ishida, Yuuki; Tsuchida, Hidekazu

    2015-08-01

    Techniques to fabricate thick multi-layer 4H-SiC epitaxial wafers were studied for very high-voltage p- and n-channel insulated gate bipolar transistors (IGBTs). Multi-layer epitaxial growth, including a thick p- drift layer (˜180 μm), was performed on a 4H-SiC n+ substrate to form a p-IGBT structure. For an n-IGBT structure, an inverted growth process was employed, in which a thick n- drift layer (˜180 μm) and a thick p++ injector layer (>55 μm) were epitaxially grown. The epitaxial growth conditions were modified to attain a low defect density, a low doping concentration, and a long carrier lifetime in the drift layers. Reduction of the forward voltage drop was attempted by using carrier lifetime enhancement processes, specifically, carbon ion implantation/annealing and thermal oxidation/annealing or hydrogen annealing. Simple PiN diodes were fabricated to demonstrate the effective conductivity modulation in the thick drift layers. The forward voltage drops of the PiN diodes with the p- and n-IGBT structures promise to obtain the extremely low-loss and very high-voltage IGBTs. The change in wafer shape during the processing of the very thick multi-layer 4H-SiC is also discussed.

  12. Comparative investigation of InGaP/GaAs/GaAsBi and InGaP/GaAs heterojunction bipolar transistors

    SciTech Connect

    Wu, Yi-Chen; Tsai, Jung-Hui; Chiang, Te-Kuang; Wang, Fu-Min

    2015-10-15

    In this article the characteristics of In{sub 0.49}Ga{sub 0.51}P/GaAs/GaAs{sub 0.975}Bi{sub 0.025} and In{sub 0.49}Ga{sub 0.51}P/GaAs heterojunction bipolar transistor (HBTs) are demonstrated and compared by two-dimensional simulated analysis. As compared to the traditional InGaP/GaAs HBT, the studied InGaP/GaAs/GaAsBi HBT exhibits a higher collector current, a lower base-emitter (B–E) turn-on voltage, and a relatively lower collector-emitter offset voltage of only 7 mV. Because the more electrons stored in the base is further increased in the InGaP/GaAs/GaAsBi HBT, it introduces the collector current to increase and the B–E turn-on voltage to decrease for low input power applications. However, the current gain is slightly smaller than the traditional InGaP/GaAs HBT attributed to the increase of base current for the minority carriers stored in the GaAsBi base.

  13. Progress Towards High-Sensitivity Arrays of Detectors of Sub-mm Radiation using Superconducting Tunnel Junctions with Radio-Frequency Single-Electron Transistors

    NASA Technical Reports Server (NTRS)

    Stevenson, T. R.; Hsieh, W.-T.; Li, M. J.; Stahle, C. M.; Wollack, E. J.; Schoelkopf, R. J.; Krebs, Carolyn (Technical Monitor)

    2002-01-01

    The science drivers for the SPIRIT/SPECS missions demand sensitive, fast, compact, low-power, large-format detector arrays for high resolution imaging and spectroscopy in the far infrared and submillimeter. Detector arrays with 10,000 pixels and sensitivity less than 10(exp 20)-20 W/Hz(exp 20)0.5 are needed. Antenna-coupled superconducting tunnel junction detectors with integrated rf single-electron transistor readout amplifiers have the potential for achieving this high level of sensitivity, and can take advantage of an rf multiplexing technique when forming arrays. The device consists of an antenna structure to couple radiation into a small superconducting volume and cause quasiparticle excitations, and a single-electron transistor to measure currents through tunnel junction contacts to the absorber volume. We will describe optimization of device parameters, and recent results on fabrication techniques for producing devices with high yield for detector arrays. We will also present modeling of expected saturation power levels, antenna coupling, and rf multiplexing schemes.

  14. Effect of 100MeV oxygen ion irradiation on silicon NPN power transistor

    SciTech Connect

    Kumar, M. Vinay; Krishnakumar, K. S.; Dinesh, C. M.; Krishnaveni, S.; Ramani

    2012-06-05

    The radiation response of npn Bipolar junction transistor (BJT) has been examined for 100 MeV O{sup 7+} ion. Key electrical properties like Gummel characteristics, dc current gain and capacitance-voltage of 100MeV O{sup 7+} ion irradiated transistor were studied before and after irradiation. The device was decapped and the electrical characterizations were performed at room temperature. Base current is observed to be more sensitive than collector current and gain appears to be degraded with ion fluence, also considerable degradation in C-V characteristics is observed and doping concentration is found to be increased along with the increase in ion fluence.

  15. STABILIZED TRANSISTOR AMPLIFIER

    DOEpatents

    Noe, J.B.

    1963-05-01

    A temperature stabilized transistor amplifier having a pair of transistors coupled in cascade relation that are capable of providing amplification through a temperature range of - 100 un. Concent 85% F to 400 un. Concent 85% F described. The stabilization of the amplifier is attained by coupling a feedback signal taken from the emitter of second transistor at a junction between two serially arranged biasing resistances in the circuit of the emitter of the second transistor to the base of the first transistor. Thus, a change in the emitter current of the second transistor is automatically corrected by the feedback adjustment of the base-emitter potential of the first transistor and by a corresponding change in the base-emitter potential of the second transistor. (AEC)

  16. Gallium arsenide-gallium nitride wafer fusion and the n-aluminum gallium arsenide/p-gallium arsenide/n-gallium nitride double heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Estrada, Sarah M.

    This dissertation describes the n-AlGaAs/p-GaAs/n-GaN heterojunction bipolar transistor (HBT), the first transistor formed via wafer fusion. The fusion process was developed as a way to combine lattice-mismatched materials for high-performance electronic devices, not obtainable via conventional all-epitaxial formation methods. Despite the many challenges of wafer fusion, successful transistors were demonstrated and improved, via the optimization of material structure and fusion process conditions. Thus, this project demonstrated the integration of disparate device materials, chosen for their optimal electronic properties, unrestricted by the conventional (and very limiting) requirement of lattice-matching. By combining an AlGaAs-GaAs emitter-base with a GaN collector, the HBT benefited from the high breakdown voltage of GaN, and from the high emitter injection efficiency and low base transit time of AlGaAs-GaAs. Because the GaAs-GaN lattice mismatch precluded an all-epitaxial formation of the HBT, the GaAs-GaN heterostructure was formed via fusion. This project began with the development of a fusion process that formed mechanically robust and electrically active GaAs-GaN heterojunctions. During the correlation of device electrical performance with a systematic variation of fusion conditions over a wide range (500--750°C, 0.5--2hours), a mid-range fusion temperature was found to induce optimal HBT electrical performance. Transmission electron microscopy (TEM) and secondary ion mass spectrometry (SIMS) were used to assess possible reasons for the variations observed in device electrical performance. Fusion process conditions were correlated with electrical (I-V), structural (TEM), and chemical (SIMS) analyses of the resulting heterojunctions, in order to investigate the trade-off between increased interfacial disorder (TEM) with low fusion temperature and increased diffusion (SIMS) with high fusion temperature. The best do device results (IC ˜ 2.9 kA/cm2 and beta

  17. Design, fabrication, and performance analysis of GaN vertical electron transistors with a buried p/n junction

    SciTech Connect

    Yeluri, Ramya Lu, Jing; Keller, Stacia; Mishra, Umesh K.; Hurni, Christophe A.; Browne, David A.; Speck, James S.; Chowdhury, Srabanti

    2015-05-04

    The Current Aperture Vertical Electron Transistor (CAVET) combines the high conductivity of the two dimensional electron gas channel at the AlGaN/GaN heterojunction with better field distribution offered by a vertical design. In this work, CAVETs with buried, conductive p-GaN layers as the current blocking layer are reported. The p-GaN layer was regrown by metalorganic chemical vapor deposition and the subsequent channel regrowth was done by ammonia molecular beam epitaxy to maintain the p-GaN conductivity. Transistors with high ON current (10.9 kA/cm{sup 2}) and low ON-resistance (0.4 mΩ cm{sup 2}) are demonstrated. Non-planar selective area regrowth is identified as the limiting factor to transistor breakdown, using planar and non-planar n/p/n structures. Planar n/p/n structures recorded an estimated electric field of 3.1 MV/cm, while non-planar structures showed a much lower breakdown voltage. Lowering the p-GaN regrowth temperature improved breakdown in the non-planar n/p/n structure. Combining high breakdown voltage with high current will enable GaN vertical transistors with high power densities.

  18. Interpreting Transistor Noise

    NASA Astrophysics Data System (ADS)

    Pospieszalski, M. W.

    2010-10-01

    The simple noise models of field effect and bipolar transistors reviewed in this article are quite useful in engineering practice, as illustrated by measured and modeled results. The exact and approximate expressions for the noise parameters of FETs and bipolar transistors reveal certain common noise properties and some general noise properties of both devices. The usefulness of these expressions in interpreting the dependence of measured noise parameters on frequency, bias, and temperature and, consequently, in checking of consistency of measured data has been demonstrated.

  19. A study of junction effect transistors and their roles in carbon nanotube field emission cathodes in compact pulsed power applications

    NASA Astrophysics Data System (ADS)

    Shui, Qiong

    This thesis is focusing on a study of junction effect transistors (JFETs) in compact pulsed power applications. Pulsed power usually requires switches with high hold-off voltage, high current, low forward voltage drop, and fast switching speed. 4H-SiC, with a bandgap of 3.26 eV (The bandgap of Si is 1.12eV) and other physical and electrical superior properties, has gained much attention in high power, high temperature and high frequency applications. One topic of this thesis is to evaluate if 4H-SiC JFETs have a potential to replace gas phase switches to make pulsed power system compact and portable. Some other pulsed power applications require cathodes of providing stable, uniform, high electron-beam current. So the other topic of this research is to evaluate if Si JFET-controlled carbon nanotube field emitter cold cathode will provide the necessary e-beam source. In the topic of "4H-SiC JFETs", it focuses on the design and simulation of a novel 4H-SiC normally-off VJFET with high breakdown voltage using the 2-D simulator ATLAS. To ensure realistic simulations, we utilized reasonable physical models and the established parameters as the input into these models. The influence of key design parameters were investigated which would extend pulsed power limitations. After optimizing the key design parameters, with a 50-mum drift region, the predicted breakdown voltage for the VJFET is above 8kV at a leakage current of 1x10-5A/cm2 . The specific on-state resistance is 35 mO·cm 2 at VGS = 2.7 V, and the switching speed is several ns. The simulation results suggest that the 4H-SiC VJFET is a potential candidate for improving switching performance in repetitive pulsed power applications. To evaluate the 4H-SiC VJFETs in pulsed power circuits, we extracted some circuit model parameters from the simulated I-V curves. Those parameters are necessary for circuit simulation program such as SPICE. This method could be used as a test bench without fabricating the devices to

  20. Novel vertical hetero- and homo-junction tunnel field-effect transistors based on multi-layer 2D crystals

    NASA Astrophysics Data System (ADS)

    Lu, Shang-Chun; Mohamed, Mohamed; Zhu, Wenjuan

    2016-03-01

    Vertical hetero- and homo-junction tunnel FET (TFET) based on multi-layer black phosphorus (BP) and transition metal dichalcogenides are proposed and studied by numerical simulations employing the semi-classical density gradient quantum correction model. It is found that the vertical TFET based on BP can achieve high on-current (>200 μA μm-1) and steep subthreshold swing (average value = 24.6 mV/dec) simultaneously, due to its high mobility, direct narrow bandgap, and low dielectric constant. We also found that the on-current in vertical TFETs based on MoS2/MoSe2 hetero-junction is two orders of magnitudes higher than the one in MoS2 homo-junction TFET, due to the reduced effective bandgap in heterostructure with staggered band alignment. In addition, we present various design considerations and recommendations as well as provide a qualitative comparison with published data.

  1. Broad Beam and Ion Microprobe Studies of Single-Event Upsets in High Speed 0.18micron Silicon Germanium Heterojunction Bipolar Transistors and Circuits

    NASA Technical Reports Server (NTRS)

    Reed, Robert A.; Marshall, Paul W.; Pickel, Jim; Carts, Martin A.; Irwin, TIm; Niu, Guofu; Cressler, John; Krithivasan, Ramkumar; Fritz, Karl; Riggs, Pam

    2003-01-01

    SiGe based technology is widely recognized for its tremendous potential to impact the high speed microelectronic industry, and therefore the space industry, by monolithic incorporation of low power complementary logic with extremely high speed SiGe Heterojunction Bipolar Transistor (HBT) logic. A variety of studies have examined the ionizing dose, displacement damage and single event characteristics, and are reported. Accessibility to SiGe through an increasing number of manufacturers adds to the importance of understanding its intrinsic radiation characteristics, and in particular the single event effect (SEE) characteristics of the high bandwidth HBT based circuits. IBM is now manufacturing in its 3rd generation of their commercial SiGe processes, and access is currently available to the first two generations (known as and 6HP) through the MOSIS shared mask services with anticipated future release of the latest (7HP) process. The 5 HP process is described and is characterized by a emitter spacing of 0.5 micron and a cutoff frequency ff of 50 GHz, whereas the fully scaled 7HP HBT employs a 0.18 micron emitter and has an fT of 120 GHz. Previous investigations have the examined SEE response of 5 HP HBT circuits through both circuit testing and modeling. Charge collection modeling studies in the 5 H P process have also been conducted, but to date no measurements have been reported of charge collection in any SiGe HBT structures. Nor have circuit models for charge collection been developed in any version other than the 5 HP HBT structure. Our investigation reports the first indications of both charge collection and circuit response in IBM s 7HP-based SiGe process. We compare broad beam heavy ion SEU test results in a fully function Pseudo-Random Number (PRN) sequence generator up to frequencies of 12 Gbps versus effective LET, and also report proton test results in the same circuit. In addition, we examine the charge collection characteristics of individual 7HP HBT

  2. Bipolar Disorder

    MedlinePlus

    ... How Can I Help a Friend Who Cuts? Bipolar Disorder KidsHealth > For Teens > Bipolar Disorder Print A A ... Bipolar Disorder en español Trastorno bipolar What Is Bipolar Disorder? Bipolar disorders are one of several medical conditions ...

  3. Design consideration and fabrication of 1.2-kV 4H-SiC trenched-and-implanted vertical junction field-effect transistors

    NASA Astrophysics Data System (ADS)

    Chen, Si-Zhe; Sheng, Kuang

    2014-07-01

    We present the design consideration and fabrication of 4H-SiC trenched-and-implanted vertical junction field-effect transistors (TI-VJFETs). Different design factors, including channel width, channel doping, and mesa height, are considered and evaluated by numerical simulations. Based on the simulation result, normally-on and normally-off devices are fabricated. The fabricated device has a 12 μm thick drift layer with 8×1015 cm-3 N-type doping and 2.6 μm channel length. The normally-on device shows a 1.2 kV blocking capability with a minimum on-state resistance of 2.33 mΩ·cm2, while the normally-off device shows an on-state resistance of 3.85 mΩ·cm2. Both the on-state and the blocking performances of the device are close to the state-of-the-art values in this voltage range.

  4. Simple phenomenological modeling of transition-region capacitance of forward-biased p-n junction diodes and transistor diodes

    NASA Technical Reports Server (NTRS)

    Lindholm, F. A.

    1982-01-01

    The derivation of a simple expression for the capacitance C(V) associated with the transition region of a p-n junction under a forward bias is derived by phenomenological reasoning. The treatment of C(V) is based on the conventional Shockley equations, and simpler expressions for C(V) result that are in general accord with the previous analytical and numerical results. C(V) consists of two components resulting from changes in majority carrier concentration and from free hole and electron accumulation in the space-charge region. The space-charge region is conceived as the intrinsic region of an n-i-p structure for a space-charge region markedly wider than the extrinsic Debye lengths at its edges. This region is excited in the sense that the forward bias creates hole and electron densities orders of magnitude larger than those in equilibrium. The recent Shirts-Gordon (1979) modeling of the space-charge region using a dielectric response function is contrasted with the more conventional Schottky-Shockley modeling.

  5. Characterization, Modeling and Design Parameters Identification of Silicon Carbide Junction Field Effect Transistor for Temperature Sensor Applications

    PubMed Central

    Salah, Tarek Ben; Khachroumi, Sofiane; Morel, Hervé

    2010-01-01

    Sensor technology is moving towards wide-band-gap semiconductors providing high temperature capable devices. Indeed, the higher thermal conductivity of silicon carbide, (three times more than silicon), permits better heat dissipation and allows better cooling and temperature management. Though many temperature sensors have already been published, little endeavours have been invested in the study of silicon carbide junction field effect devices (SiC-JFET) as a temperature sensor. SiC-JFETs devices are now mature enough and it is close to be commercialized. The use of its specific properties versus temperatures is the major focus of this paper. The SiC-JFETs output current-voltage characteristics are characterized at different temperatures. The saturation current and its on-resistance versus temperature are successfully extracted. It is demonstrated that these parameters are proportional to the absolute temperature. A physics-based model is also presented. Relationships between on-resistance and saturation current versus temperature are introduced. A comparative study between experimental data and simulation results is conducted. Important to note, the proposed model and the experimental results reflect a successful agreement as far as a temperature sensor is concerned. PMID:22315547

  6. Ultra-stable oscillator with complementary transistors

    NASA Technical Reports Server (NTRS)

    Kleinberg, L. L. (Inventor)

    1974-01-01

    A high frequency oscillator, having both good short and long term stability, is formed by including a piezoelectric crystal in the base circuit of a first bi-polar transistor circuit, the bi-polar transistor itself operated below its transitional frequency and having its emitter load chosen so that the input impedance, looking into the base thereof, exhibits a negative resistance in parallel with a capacitive reactance. Combined with this basic circuit is an auxiliary, complementary, second bi-polar transistor circuit of the same form with the piezoelectric crystal being common to both circuits. By this configuration small changes in quiescent current are substantially cancelled by opposite variations in the second bi-polar transistor circuit, thereby achieving from the oscillator a signal having its frequency of oscillation stable over long time periods as well as short time periods.

  7. Optimization of Vertical Double-Diffused Metal-Oxide Semiconductor (VDMOS) Power Transistor Structure for Use in High Frequencies and Medical Devices.

    PubMed

    Farhadi, Rozita; Farhadi, Bita

    2014-01-01

    Power transistors, such as the vertical, double-diffused, metal-oxide semiconductor (VDMOS), are used extensively in the amplifier circuits of medical devices. The aim of this research was to construct a VDMOS power transistor with an optimized structure to enhance the operation of medical devices. First, boron was implanted in silicon by implanting unclamped inductive switching (UIS) and a Faraday shield. The Faraday shield was implanted in order to replace the gate-field parasitic capacitor on the entry part of the device. Also, implanting the UIS was used in order to decrease the effect of parasitic bipolar junction transistor (BJT) of the VDMOS power transistor. The research tool used in this study was Silvaco software. By decreasing the transistor entry resistance in the optimized VDMOS structure, power losses and noise at the entry of the transistor were decreased, and, by increasing the breakdown voltage, the lifetime of the VDMOS transistor lifetime was increased, which resulted in increasing drain flow and decreasing Ron. This consequently resulted in enhancing the operation of high-frequency medical devices that use transistors, such as Radio Frequency (RF) and electrocardiograph machines. PMID:25763152

  8. Bipolar disorder

    MedlinePlus

    Manic depression; Bipolar affective disorder; Mood disorder - bipolar; Manic depressive disorder ... Bipolar disorder affects men and women equally. It most often starts between ages 15 and 25. The exact ...

  9. Bipolar disorder

    MedlinePlus

    Manic depression; Bipolar affective disorder; Mood disorder - bipolar; Manic depressive disorder ... happiness and high activity or energy (mania) or depression and low activity or energy (depression). The following ...

  10. Radiation-induced 1/f noise degradation of bipolar linear voltage regulator

    NASA Astrophysics Data System (ADS)

    Qifeng, Zhao; Yiqi, Zhuang; Junlin, Bao; Wei, Hu

    2016-03-01

    Radiation-induced 1/f noise degradation in the LM117 bipolar linear voltage regulator is studied. Based on the radiation-induced degradation mechanism of the output voltage, it is suggested that the band-gap reference subcircuit is the critical component which leads to the 1/f noise degradation of the LM117. The radiation makes the base surface current of the bipolar junction transistors of the band-gap reference subcircuit increase, which leads to an increase in the output 1/f noise of the LM117. Compared to the output voltage, the 1/f noise parameter is more sensitive, it may be used to evaluate the radiation resistance capability of LM117. Project supported by the National Natural Science Foundation of China (Nos. 61076101, 61204092).

  11. Metamorphosis of the transistor into a laser

    NASA Astrophysics Data System (ADS)

    Feng, M.; Holonyak, N., Jr.

    2015-01-01

    Based on the invention and operation of the transistor, the alloy diode laser, the quantum-well diode laser and the high-speed heterojunction bipolar transistor (HBT), we have invented and realized now a transistor laser (TL). The transistor laser is a three-terminal technology providing coupling and the coherent light emission in the transistor. The quantum-well (QW) heterojunction bipolar transistor laser, inherently a fast switching device, operates by transporting a small minority base charge density ˜1016 \\text{cm}-3 over a nanoscale base thickness (<900 \\text{A}) in picoseconds. The TL, owing to its fast recombination speed, its unique three-terminal configuration, and complementary nature of its optical and electrical collector output signals, enables resonance-free base current and collector voltage modulation. It is a compact source of electro-optical applications such as nonlinear signal mixing, frequency multiplication, negative feedback, and optoelectronics logic gates.

  12. AlGaAs/GaAs/InGaAs pnp-type vertical-cavity surface-emitting transistor-lasers.

    PubMed

    Xiang, Y; Reuterskiöld-Hedlund, C; Yu, X; Yang, C; Zabel, T; Hammar, M; Akram, M N

    2015-06-15

    We report on the design, fabrication and analysis of vertical-cavity surface-emitting transistor-lasers (T-VCSELs) based on the homogeneous integration of an InGaAs/GaAs VCSEL and an AlGaAs/GaAs pnp-heterojunction bipolar transistor (HBT). Epitaxial regrowth confinement, modulation doping, intracavity contacting and non-conducting mirrors are used to ensure a low-loss structure, and a variety of design variations are investigated for a proper internal biasing and current injection to ensure a wide operating range. Optimized devices show mW-range output power, mA-range base threshold current and high-temperature operation to at least 60°C with the transistor in its active mode of operation for base currents well beyond threshold. Current confinement schemes based on pnp-blocking layers or a buried tunnel junction are investigated as well as asymmetric current injection for reduced extrinsic resistances. PMID:26193547

  13. Quantum Thermal Transistor.

    PubMed

    Joulain, Karl; Drevillon, Jérémie; Ezzahri, Younès; Ordonez-Miranda, Jose

    2016-05-20

    We demonstrate that a thermal transistor can be made up with a quantum system of three interacting subsystems, coupled to a thermal reservoir each. This thermal transistor is analogous to an electronic bipolar one with the ability to control the thermal currents at the collector and at the emitter with the imposed thermal current at the base. This is achieved by determining the heat fluxes by means of the strong-coupling formalism. For the case of three interacting spins, in which one of them is coupled to the other two, that are not directly coupled, it is shown that high amplification can be obtained in a wide range of energy parameters and temperatures. The proposed quantum transistor could, in principle, be used to develop devices such as a thermal modulator and a thermal amplifier in nanosystems. PMID:27258859

  14. Quantum Thermal Transistor

    NASA Astrophysics Data System (ADS)

    Joulain, Karl; Drevillon, Jérémie; Ezzahri, Younès; Ordonez-Miranda, Jose

    2016-05-01

    We demonstrate that a thermal transistor can be made up with a quantum system of three interacting subsystems, coupled to a thermal reservoir each. This thermal transistor is analogous to an electronic bipolar one with the ability to control the thermal currents at the collector and at the emitter with the imposed thermal current at the base. This is achieved by determining the heat fluxes by means of the strong-coupling formalism. For the case of three interacting spins, in which one of them is coupled to the other two, that are not directly coupled, it is shown that high amplification can be obtained in a wide range of energy parameters and temperatures. The proposed quantum transistor could, in principle, be used to develop devices such as a thermal modulator and a thermal amplifier in nanosystems.

  15. Study of In 0.49Ga 0.51P/GaAs/In 0.49Ga 0.51P double δ-doped heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Wang, Wei-Chou; Chen, Jing-Yuh; Pan, Hsi-Jen; Feng, Shun-Ching; Yu, Kuo-Hui; Liu, Wen-Chau

    1999-07-01

    A lattice-matched In 0.49Ga 0.51P/GaAs/In 0.49Ga 0.51P double δ -doped heterojunction bipolar transistor, prepared by low-pressure metal organic chemical vapor deposition (LP-MOCVD), is fabricated successfully and reported. Due to the insertion of δ -doped sheets and setback layers both at base-emitter (B-E) and base-collector (B-C) heterojunctions, the potential spikes are suppressed significantly. In addition, the electron blocking effect is removed and a dramatic improvement of current gain is obtained. A modified Ebers-Moll model is employed to study and analyse the device performances. The experimental results show that the common-emitter current gain over 210 at the collector current of 35 mA and an offset voltage ΔVCE smaller than 50 mV are obtained. Also, a lower knee-shaped voltage of 1.4 V at the collector current of 40 mA is observed. These results indicate that the device studied is a good candidate for high-speed and high-power circuit applications.

  16. 50-200 GHz Silicon-Germanium Heterojunction Bipolar Transistor BICMOS Technology and a Computer-Aided Design Environment for 2--50+ GHz Very Large-Scale Integration Mixed-Signal ICs

    NASA Astrophysics Data System (ADS)

    Subbanna, Seshadri; Freeman, Gregory; Rieh, Jae-Sung; Ahlgren, David; Stein, Kenneth; Dickey, Carl; Mecke, James; Bacon, Peter; Groves, Robert; Meghelli, Mounir; Soyuer, Mehmet; Jagannathan, Basanth; Schonenberg, Kathryn; Jeng, Shwu-Jen; Joseph, Alvin; Coolbaugh, Douglas; Volant, Richard; Greenberg, David; Chen, Huajie; Brelsford, Kevin; Harame, David; Dunn, James; Larson, Lawrence; Herman, Dean; Meyerson, Bernard

    2002-02-01

    Silicon-germanium (SiGe) heterojunction bipolar transistor (HBT) BICMOS technology is a stable, ultra-high performance, semiconductor technology capable of supporting mixed-signal, very large-scale integration (VLSI) circuit designs for a variety of emerging communication applications. This technology is supported by a computer-aided design (CAD) system that supports a variety of high-performance circuit designs, mixed-signal circuit block reuse, and the ability to accurately predict circuit performance at the highest frequencies. This paper summarizes the progress this technology has made in recent years in moving from the research laboratory to a production environment. We also specifically address performance, operating voltage, reliability and integration considerations for using 100--200 GHz SiGe HBTs in high-speed (10--40 Gb/s) network ICs, an application space previously only addressed by InP technology. All indications are that SiGe will be very successful at addressing this new application space, and all facets of the networking IC market.

  17. John Bardeen and transistor physics

    NASA Astrophysics Data System (ADS)

    Huff, Howard R.

    2001-01-01

    John Bardeen and Walter Brattain invented the point-contact semiconductor amplifier (transistor action) in polycrystalline germanium (also observed in polycrystalline silicon) on Dec. 15, 1947, for which they received a patent on Oct. 3, 1950. Bill Shockley was not a co-patent holder on Bardeen and Brattain's point-contact semiconductor amplifier patent since Julius Lilienfeld had already received a patent in 1930 for what would have been Shockley's contribution; namely, the field-effect methodology. Shockley received patents for both his minority-carrier injection concept and junction transistor theory, however, and deservedly shared the Nobel prize with Bardeen and Brattain for his seminal contributions of injection, p-n junction theory and junction transistor theory. We will review the events leading up to the invention of Bardeen and Brattain's point-contact semiconductor amplifier during the magic month of November 17-December 16, 1947 and the invention of Shockley's junction semiconductor amplifier during his magic month of December 24, 1947-January 23, 1948. It was during the course of Bardeen and Brattain's research in November, 1947 that Bardeen also patented the essence of the MOS transistor, wherein the induced minority carriers were confined to the inversion layer enroute to the collector. C. T. Sah has described this device as a sourceless MOS transistor. Indeed, John Bardeen, co-inventor of the point-contact semiconductor amplifier and inventor of the MOS transistor, may rightly be called the father of modern electronics.

  18. Bipolar Disorder

    MedlinePlus

    Bipolar disorder is a serious mental illness. People who have it go through unusual mood changes. They go ... The down feeling is depression. The causes of bipolar disorder aren't always clear. It runs in families. ...

  19. Simulating Single-Event Upsets in Bipolar RAM's

    NASA Technical Reports Server (NTRS)

    Zoutendyk, J. A.

    1986-01-01

    Simulation technique saves testing. Uses interactive version of SPICE (Simulation Program with Integrated Circuit Emphasis). Device and subcircuit models available in software used to construct macromodel for an integrated bipolar transistor. Time-dependent current generators placed inside transistor macromodel to simulate charge collection from ion track. Significant finding of experiments is standard design practice of reducing power in unaddressed bipolar RAM cell increases sensitivity of cell to single-event upsets.

  20. A review of InP/InAlAs/InGaAs based transistors for high frequency applications

    NASA Astrophysics Data System (ADS)

    Ajayan, J.; Nirmal, D.

    2015-10-01

    This paper presents an overview of the rapid progress being made in the development of InP based devices for high speed applications. Over the past few decades, major aero space industries have been developing InP based hetero structure devices like hetero junction bipolar transistors (HBTs) and high electron mobility transistors (HEMT) because of their low DC power due to excellent low voltage operation and milli-meter wave frequency performance even though its widespread use has been limited by high cost. InP based HBTs, MOSFETs and HEMTs have also been developed by commercial companies for applications in high speed fiber optic communications because InP based device technologies takes advantage of the intrinsic material properties such as high thermal conductivity, high electron mobility and low energy band gap for low voltage operation compared to silicon, silicon-germenium, and GaAs based semiconductor devices.

  1. Design considerations for FET-gated power transistors

    NASA Technical Reports Server (NTRS)

    Chen, D. Y.; Chin, S. A.

    1983-01-01

    An FET-bipolar combinational power transistor configuration (tested up to 300 V, 20 A at 100 kHz) is described. The critical parameters for integrating the chips in hybrid form are examined, and an effort to optimize the overall characteristics of the configuration is discussed. Chip considerations are examined with respect to the voltage and current rating of individual chips, the FET surge capability, the choice of triple diffused transistor or epitaxial transistor for the bipolar element, the current tailing effect, and the implementation of the bipolar transistor and an FET as single chip or separate chips. Package considerations are discussed with respect to package material and geometry, surge current capability of bipolar base terminal bonding, and power losses distribution.

  2. Evaluating the interfacial reaction kinetics of the bipolar membrane interface in the bipolar membrane fuel cell.

    PubMed

    Peng, Sikan; Lu, Shanfu; Zhang, Jin; Sui, Pang-Chieh; Xiang, Yan

    2013-07-21

    A reaction kinetic model of the bipolar membrane interface in the bipolar membrane fuel cell (BPMFC) was proposed based on the p-n junction theory and chemical reaction kinetics. It verified the self-humidification feasibility of the BPMFC successfully. PMID:23744271

  3. Control of normal and abnormal bipolar resistive switching by interface junction on In/Nb:SrTiO{sub 3} interface

    SciTech Connect

    Sun, J.; Jia, C. H.; Li, G. Q.; Zhang, W. F.

    2012-09-24

    The resistive switching behaviors of indium (In)/Nb:SrTiO{sub 3} (NSTO) with different metal/semiconductor contacts are investigated. The In electrodes with the Schottky contacts are fabricated on NSTO surface using direct current reactive magnetron sputtering, and the fresh In is directly pressed to form the Ohmic contact. The device with one Schottky barrier displays a normal bipolar resistive switching (BRS) behavior, while the device with two Schottky barriers shows an abnormal BRS behavior. The results demonstrate that the injection and trapping or detrapping of carriers near the interface between the metal electrode and semiconductor are closely related to the resistive switching performance.

  4. Metamorphic Ga0.76In0.24As/GaAs0.75Sb0.25 tunnel junctions grown on GaAs substrates

    NASA Astrophysics Data System (ADS)

    García, I.; Geisz, J. F.; France, R. M.; Kang, J.; Wei, S.-H.; Ochoa, M.; Friedman, D. J.

    2014-08-01

    Lattice-matched and pseudomorphic tunnel junctions have been developed in the past for application in a variety of semiconductor devices, including heterojunction bipolar transistors, vertical cavity surface-emitting lasers, and multijunction solar cells. However, metamorphic tunnel junctions have received little attention. In 4-junction Ga0.51In0.49P/GaAs/Ga0.76In0.24As/Ga0.47In0.53As inverted-metamorphic solar cells (4J-IMM), a metamorphic tunnel junction is required to series connect the 3rd and 4th junctions. We present a tunnel junction based on a metamorphic Ga0.76In0.24As/GaAs0.75Sb0.25 structure for this purpose. This tunnel junction is grown on a metamorphic Ga0.76In0.24As template on a GaAs substrate. The band offsets in the resulting type-II heterojunction are calculated using the first-principles density functional method to estimate the tunneling barrier height and assess the performance of this tunnel junction against other material systems and compositions. The effect of the metamorphic growth on the performance of the tunnel junctions is analyzed using a set of metamorphic templates with varied surface roughness and threading dislocation density. Although the metamorphic template does influence the tunnel junction performance, all tunnel junctions measured have a peak current density over 200 A/cm2. The tunnel junction on the best template has a peak current density over 1500 A/cm2 and a voltage drop at 15 A/cm2 (corresponding to operation at 1000 suns) lower than 10 mV, which results in a nearly lossless series connection of the 4th junction in the 4J-IMM structure.

  5. Method for double-sided processing of thin film transistors

    DOEpatents

    Yuan, Hao-Chih; Wang, Guogong; Eriksson, Mark A.; Evans, Paul G.; Lagally, Max G.; Ma, Zhenqiang

    2008-04-08

    This invention provides methods for fabricating thin film electronic devices with both front- and backside processing capabilities. Using these methods, high temperature processing steps may be carried out during both frontside and backside processing. The methods are well-suited for fabricating back-gate and double-gate field effect transistors, double-sided bipolar transistors and 3D integrated circuits.

  6. Neurons from rat brain coupled to transistors

    NASA Astrophysics Data System (ADS)

    Vassanelli, S.; Fromherz, P.

    Field-effect transistors form spontaneously capacitive junctions with cultured nerve cells from rat brains. The transfer of ac signals from neurons to silicon is studied and used to parametrize an equivalent circuit. The coupling is distinctly weaker than in junctions assembled with leech nerve cells. The implications with respect to the recording and stimulation of neuronal activity by silicon devices are considered.

  7. Bipolar Disorder.

    ERIC Educational Resources Information Center

    Spearing, Melissa

    Bipolar disorder, a brain disorder that causes unusual shifts in a person's mood, affects approximately one percent of the population. It commonly occurs in late adolescence and is often unrecognized. The diagnosis of bipolar disorder is made on the basis of symptoms, course of illness, and when possible, family history. Thoughts of suicide are…

  8. Bipolar Disorder

    MedlinePlus

    ... or digestive problems Problems sleeping, or wanting to sleep all of the time Feeling tired all of the time Thoughts about death and suicide Causes & Risk Factors What causes bipolar disorder? Bipolar disorder may be caused by a chemical imbalance in the brain. It sometimes runs in ...

  9. Bipolar disorder.

    PubMed

    Grande, Iria; Berk, Michael; Birmaher, Boris; Vieta, Eduard

    2016-04-01

    Bipolar disorder is a recurrent chronic disorder characterised by fluctuations in mood state and energy. It affects more than 1% of the world's population irrespective of nationality, ethnic origin, or socioeconomic status. Bipolar disorder is one of the main causes of disability among young people, leading to cognitive and functional impairment and raised mortality, particularly death by suicide. A high prevalence of psychiatric and medical comorbidities is typical in affected individuals. Accurate diagnosis of bipolar disorder is difficult in clinical practice because onset is most commonly a depressive episode and looks similar to unipolar depression. Moreover, there are currently no valid biomarkers for the disorder. Therefore, the role of clinical assessment remains key. Detection of hypomanic periods and longitudinal assessment are crucial to differentiate bipolar disorder from other conditions. Current knowledge of the evolving pharmacological and psychological strategies in bipolar disorder is of utmost importance. PMID:26388529

  10. Electronic Model of a Ferroelectric Field Effect Transistor

    NASA Technical Reports Server (NTRS)

    MacLeod, Todd C.; Ho, Fat Duen; Russell, Larry (Technical Monitor)

    2001-01-01

    A pair of electronic models has been developed of a Ferroelectric Field Effect transistor. These models can be used in standard electrical circuit simulation programs to simulate the main characteristics of the FFET. The models use the Schmitt trigger circuit as a basis for their design. One model uses bipolar junction transistors and one uses MOSFET's. Each model has the main characteristics of the FFET, which are the current hysterisis with different gate voltages and decay of the drain current when the gate voltage is off. The drain current from each model has similar values to an actual FFET that was measured experimentally. T'he input and o Output resistance in the models are also similar to that of the FFET. The models are valid for all frequencies below RF levels. No attempt was made to model the high frequency characteristics of the FFET. Each model can be used to design circuits using FFET's with standard electrical simulation packages. These circuits can be used in designing non-volatile memory circuits and logic circuits and is compatible with all SPICE based circuit analysis programs. The models consist of only standard electrical components, such as BJT's, MOSFET's, diodes, resistors, and capacitors. Each model is compared to the experimental data measured from an actual FFET.