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Sample records for chemical vapor infiltration

  1. Microwave assisted chemical vapor infiltration

    SciTech Connect

    Devlin, D.J.

    1993-12-31

    The purpose of this program is to develop a new process for the fabrication of ceramic matrix composites by chemical vapor infiltration. This period has been devoted in part to the exploration of material systems suitable for MACVI processing. A number of potential processing schemes are possible using combinations of absorbing and transparent material as composite components. This includes the use of an absorbing preform (nicalon fiber) combined with a transparent matrix (silicon nitride). Composites 5 cm in diameter by 1 cm. thick have been fabricated to densities of 65% theoretical. Processing times for these materials are under 20 hours. Higher densities will require additional microwave power now possible with the new reactor. The most effective MACVI scheme will involve the use of a transparent fiber with an absorbing matrix. The hot spot will be initiated by appropriate treatment of the central region of the preform. To this end alumna fibers with pretreatments to control thermal gradients has been explored. Nextel 610 fibers have been effectively pretreated carbon coating resulting in preferential heating in the interior of the preform. Possible matrix materials include siliconized silicon carbide, doped silicon carbide, alumna and zirconia. A patent for MACVI has been issued 10/19/93.

  2. Chemical vapor infiltration of carbon fiber bundles

    SciTech Connect

    Currier, R.P.; Devlin, D.J.; Barbero, R.S.

    1992-12-31

    Chemical vapor infiltration in carbon fiber bundles is studied under isothermal conditions over the temperature range 1000--1090 C at a nominal pressure of 300 Torr. Pyrolytic decomposition of methane is used in the infiltration experiments with carbon weight gain data obtained continuously from thermogravimetric analysis. The sensitivity of the infiltration dynamics to initial yarn porosity and to spatial variations in fiber positioning are explored. Results indicate that small changes in initial porosity can have significant impact on the weight gain above the solid phase percolation threshold.

  3. Chemical vapor infiltration of carbon fiber bundles

    SciTech Connect

    Currier, R.P.; Devlin, D.J.; Barbero, R.S.

    1992-01-01

    Chemical vapor infiltration in carbon fiber bundles is studied under isothermal conditions over the temperature range 1000--1090 C at a nominal pressure of 300 Torr. Pyrolytic decomposition of methane is used in the infiltration experiments with carbon weight gain data obtained continuously from thermogravimetric analysis. The sensitivity of the infiltration dynamics to initial yarn porosity and to spatial variations in fiber positioning are explored. Results indicate that small changes in initial porosity can have significant impact on the weight gain above the solid phase percolation threshold.

  4. Fabrication of fiber-reinforced composites by chemical vapor infiltration

    SciTech Connect

    Matlin, W.M.; Stinton, D.P.; Besmann, T.M.

    1995-08-01

    A two-step forced chemical vapor infiltration process was developed that reduced infiltration times for 4.45 cm dia. by 1.27 cm thick Nicalon{sup +} fiber preforms by two thirds while maintaining final densities near 90 %. In the first stage of the process, micro-voids within fiber bundles in the cloth were uniformly infiltrated throughout the preform. In the second stage, the deposition rate was increased to more rapidly fill the macro-voids between bundles within the cloth and between layers of cloth. By varying the thermal gradient across the preform uniform infiltration rates were maintained and high final densities achieved.

  5. Chemical vapor infiltration of non-oxide ceramic matrix composites

    SciTech Connect

    Besmann, T.M.; Stinton, D.P.; Lowden, R.A.

    1993-12-31

    Continuous fiber ceramic composites are enabling new, high temperature structural applications. Chemical vapor infiltration methods for producing these composites are being investigated, with the complexity of filament weaves and deposition chemistry merged with standard heat and mass transport relationships. Silicon carbide- based materials are, by far, the most mature, and are already being used in aerospace applications. This paper addresses the state-of-the-art of the technology and outlines current issues.

  6. Optimization of bundle infiltration in the forced chemical vapor infiltration (FCVI) process

    SciTech Connect

    Matlin, W.M.; Liaw, P.K.; Stinton, D.P.; Besmann, T.M.

    1995-10-01

    A two-step forced-flow, thermal-gradient, chemical vapor infiltration process (FCVI) was proposed to reduced processing time while maintaining uniformly high densities. GTCVI, a finite-volume computer code developed specifically for the FCVI process was used to model thermal gradient effects on processing time and density. An optimum thermal gradient was determined and used to process material with uniformly infiltrated bundles.

  7. Fabrication of fiber-reinforced composites by chemical vapor infiltration

    SciTech Connect

    Besmann, T.M.; McLaughlin, J.C.; Probst, K.J.; Anderson, T.J.; Starr, T.L.

    1997-12-01

    Silicon carbide-based heat exchanger tubes are of interest to energy production and conversion systems due to their excellent high temperature properties. Fiber-reinforced SiC is of particular importance for these applications since it is substantially tougher than monolithic SiC, and therefore more damage and thermal shock tolerant. This paper reviews a program to develop a scaled-up system for the chemical vapor infiltration of tubular shapes of fiber-reinforced SiC. The efforts include producing a unique furnace design, extensive process and system modeling, and experimental efforts to demonstrate tube fabrication.

  8. Advances in modeling of chemical vapor infiltration for tube fabrication

    SciTech Connect

    Starr, T.L.

    1998-04-01

    The forced flow/thermal gradient chemical vapor infiltration process (FCVI) can be used for fabrication of tube-shaped components of ceramic matrix composites. Recent experimental work at Oak Ridge National Laboratory (ORNL) includes process and materials development studies using a small tube reactor. Use of FCVI for this geometry involves significant changes in fixturing as compared to disk-shaped preforms previously fabricated. The authors have used their computer model of the CVI process to simulate tube densification and to identify process modifications that will decrease processing time. This report presents recent model developments and applications.

  9. Chemical vapor deposited fiber coatings and chemical vapor infiltrated ceramic matrix composites

    SciTech Connect

    Kmetz, M.A.

    1992-01-01

    Conventional Chemical Vapor Deposition (CVD) and Organometallic Chemical Vapor Deposition (MOCVD) were employed to deposit a series of interfacial coatings on SiC and carbon yarn. Molybdenum, tungsten and chromium hexacarbonyls were utilized as precursors in a low temperature (350[degrees]C) MOCVD process to coat SiC yarn with Mo, W and Cr oxycarbides. Annealing studies performed on the MoOC and WOC coated SiC yarns in N[sub 2] to 1,000[degrees]C establish that further decomposition of the oxycarbides occurred, culminating in the formation of the metals. These metals were then found to react with Si to form Mo and W disilicide coatings. In the Cr system, heating in N[sub 2] above 800[degrees]C resulted in the formation of a mixture of carbides and oxides. Convention CVD was also employed to coat SiC and carbon yarn with C, Bn and a new interface designated BC (a carbon-boron alloy). The coated tows were then infiltrated with SiC, TiO[sub 2], SiO[sub 2] and B[sub 4]C by a chemical vapor infiltration process. The B-C coatings were found to provide advantageous interfacial properties over carbon and BN coatings in several different composite systems. The effectiveness of these different coatings to act as a chemically inert barrier layer and their relationship to the degree of interfacial debonding on the mechanical properties of the composites were examined. The effects of thermal stability and strength of the coated fibers and composites were also determined for several difference atmospheres. In addition, a new method for determining the tensile strength of the as-received and coated yarns was also developed. The coated fibers and composites were further characterized by AES, SEM, XPS, IR and X-ray diffraction analysis.

  10. Mass transport measurements and modeling for chemical vapor infiltration

    SciTech Connect

    Starr, T.L.; Chiang, D.Y.; Fiadzo, O.G.; Hablutzel, N.

    1997-12-01

    This project involves experimental and modeling investigation of densification behavior and mass transport in fiber preforms and partially densified composites, and application of these results to chemical vapor infiltration (CVI) process modeling. This supports work on-going at ORNL in process development for fabrication of ceramic matrix composite (CMC) tubes. Tube-shaped composite preforms are fabricated at ORNL with Nextel{trademark} 312 fiber (3M Corporation, St. Paul, MN) by placing and compressing several layers of braided sleeve on a tubular mandrel. In terms of fiber architecture these preforms are significantly different than those made previously with Nicalon{trademark} fiber (Nippon Carbon Corp., Tokyo, Japan) square weave cloth. The authors have made microstructure and permeability measurements on several of these preforms and a few partially densified composites so as to better understand their densification behavior during CVI.

  11. Rapid fabrication of ceramic composite tubes using chemical vapor infiltration

    SciTech Connect

    Starr, T.L.; Chiang, D.; Besmann, T.M.; Stinton, D.P.; McLaughlin, J.C.; Matlin, W.M.

    1996-06-01

    Ceramic composite tubes can be fabricated with silicon carbide matrix and Nicalon fiber reinforcement using forced flow-thermal gradient chemical vapor infiltration (FCVI). The process model GTCVI is used to design the equipment configuration and to identify conditions for rapid, uniform densification. The initial injector and mandrel design produced radial and longitudinal temperature gradients too large for uniform densification. Improved designs have been evaluated with the model. The most favorable approach utilizes a free-standing preform and an insulated water-cooled gas injector. Selected process conditions are based on the temperature limit of the fiber, matrix stoichiometry and reagent utilization efficiency. Model runs for a tube 12 inches long, 4 inches OD and 1/4 inch wall thickness show uniform densification in approximately 15 hours.

  12. Chemical vapor infiltration of TiB{sub 2} composites

    SciTech Connect

    Besmann, T.M.

    1995-05-01

    This program is designed to develop a Hall-Heroult aluminum smelting cathode with substantially improved properties. The carbon cathodes in current use require significant anode-to-cathode spacing in order to prevent shorting, causing significant electrical inefficiencies. This is due to the non-wettability of carbon by aluminum which causes instability in the cathodic aluminum pad. It is suggested that a fiber reinforced-TiB{sub 2} matrix composite would have the requisite wettability, strength, strain-to-failure, cost, and lifetime to solve this problem. The approach selected to fabricate such a cathode material is chemical vapor infiltration (CVI). This program is designed to evaluate potential fiber reinforcements, fabricate test specimens, and test the materials in a static bath and lab-scale Hall cell.

  13. Chemical vapor infiltration of TiB[sub 2] composites

    SciTech Connect

    Besmann, T.M.; Miller, J.H.; Cooley, K.C.; Lowden, R.A. ); Starr, T.L. )

    1993-01-01

    Efficiency of the Hall-Heroult electrolytic reduction of aluminum can be substantially improved by the use of a TiB[sub 2] cathode surface. The use of TiB[sub 2], however, has been hampered by the brittle nature of the material and the grain-boundary attack of sintering-aid phases by molten aluminum. In the current work, TiB[sub 2] is toughened through the use of reinforcing fibers, with chemical vapor infiltration (CVI) used to produce pure TiB[sub 2]. It has been observed, however, that the formation of TiB[sub 2] from chloride precursors at fabrication temperatures below 900 to 1000[degrees]C alloys the retention of destructive levels of chlorine in the material. At higher fabrication temperatures and under appropriate infiltration conditions, as determined from the use of a process model, a TIB[sub 2]THORNEL P-25 fiber composite, 45 mm in diam and 6 mm thick, has been fabricated in 20 h. The material has been demonstrated to be stable in molten aluminum in short-duration tests.

  14. Chemical vapor infiltration of TiB{sub 2} composites

    SciTech Connect

    Besmann, T.M.; Miller, J.H.; Cooley, K.C.; Lowden, R.A.; Starr, T.L.

    1993-01-01

    Efficiency of the Hall-Heroult electrolytic reduction of aluminum can be substantially improved by the use of a TiB{sub 2} cathode surface. The use of TiB{sub 2}, however, has been hampered by the brittle nature of the material and the grain-boundary attack of sintering-aid phases by molten aluminum. In the current work, TiB{sub 2} is toughened through the use of reinforcing fibers, with chemical vapor infiltration (CVI) used to produce pure TiB{sub 2}. It has been observed, however, that the formation of TiB{sub 2} from chloride precursors at fabrication temperatures below 900 to 1000{degrees}C alloys the retention of destructive levels of chlorine in the material. At higher fabrication temperatures and under appropriate infiltration conditions, as determined from the use of a process model, a TIB{sub 2}THORNEL P-25 fiber composite, 45 mm in diam and 6 mm thick, has been fabricated in 20 h. The material has been demonstrated to be stable in molten aluminum in short-duration tests.

  15. Modeling of forced flow/thermal gradient chemical vapor infiltration

    SciTech Connect

    Starr, T.L.; Smith, A.W.

    1992-09-01

    The forced flow/thermal gradient chemical vapor infiltration process (FCVI) has proven to be a successful technique for fabrication of ceramic matrix composites. It is particularly attractive for thick components which cannot be fabricated using the conventional, isothermal method (ICVI). Although it offers processing times that are at least an order of magnitude shorter than ICVI, FCVI has not been used to fabricate parts of complex geometry and is perceived by some to be unsuitable for such components. The major concern Is that selection and control of the flow pattern and thermal profile for optimum infiltration can be a difficult and costly exercise. In order to reduce this effort, we are developing a computer model for FCVI that simulates the densification process for given component geometry, reactor configuration and operating parameters. Used by a process engineer, this model can dramatically reduce the experimental effort needed to obtain uniform densification. A one-dimensional process model, described in a previous interim report, has demonstrated good agreement with experimental results in predicting overall densification time and density uniformity during processing and the effect of various fiber architectures and operating parameters on these process issues. This model is fundamentally unsuitable for more complex geometries, however, and extension to two- and three-dimensions is necessary. This interim report summarizes our progress since the previous interim report toward development of a ``finite volume`` model for FCVI.

  16. Modeling of forced flow/thermal gradient chemical vapor infiltration

    SciTech Connect

    Starr, T.L.; Smith, A.W. )

    1992-09-01

    The forced flow/thermal gradient chemical vapor infiltration process (FCVI) has proven to be a successful technique for fabrication of ceramic matrix composites. It is particularly attractive for thick components which cannot be fabricated using the conventional, isothermal method (ICVI). Although it offers processing times that are at least an order of magnitude shorter than ICVI, FCVI has not been used to fabricate parts of complex geometry and is perceived by some to be unsuitable for such components. The major concern Is that selection and control of the flow pattern and thermal profile for optimum infiltration can be a difficult and costly exercise. In order to reduce this effort, we are developing a computer model for FCVI that simulates the densification process for given component geometry, reactor configuration and operating parameters. Used by a process engineer, this model can dramatically reduce the experimental effort needed to obtain uniform densification. A one-dimensional process model, described in a previous interim report, has demonstrated good agreement with experimental results in predicting overall densification time and density uniformity during processing and the effect of various fiber architectures and operating parameters on these process issues. This model is fundamentally unsuitable for more complex geometries, however, and extension to two- and three-dimensions is necessary. This interim report summarizes our progress since the previous interim report toward development of a finite volume'' model for FCVI.

  17. Properties of chemical vapor infiltration diamond deposited in a diamond powder matrix

    SciTech Connect

    Panitz, J.K.G.; Tallant, D.R.; Hills, C.R.; Staley, D.J.

    1993-12-31

    Densifying non-mined diamond powder precursors with diamond produced by chemical vapor infiltration (CVI) is an attractive approach for forming thick diamond deposits that avoids many potential manufacturability problems associated with predominantly chemical vapor deposition (CVD) processes. The authors have developed two techniques: electrophoretic deposition and screen printing, to form nonmined diamond powder precursors on substrates. They then densify these precursors in a hot filament assisted reactor. Analysis indicated that a hot filament assisted chemical vapor infiltration process forms intergranular diamond deposits with properties that are to some degree different from predominantly hot-filament-assisted CVD material.

  18. Fabrication of fiber-reinforced composites by chemical vapor infiltration

    SciTech Connect

    Besmann, T.M.; Stinton, D.P.; Matlin, W.M.; Liaw, P.K.

    1996-08-01

    Processing equipment for the infiltration of fiber-reinforced composite tubes is being designed that incorporates improvements over the equipment used to infiltrate disks. A computer-controlled machine-man interface is being developed to allow for total control of all processing variables. Additionally, several improvements are being made to the furnace that will reduce the complexity and cost of the process. These improvements include the incorporation of free standing preforms, cast mandrels, and simpler graphite heating elements.

  19. Fabrication of fiber-reinforced composites by chemical vapor infiltration

    SciTech Connect

    Besmann, T.M.; Matlin, W.M.; Stinton, D.P.; Liaw, P.K.

    1996-06-01

    Processing equipment for the infiltration of fiber-reinforced composite tubes is being designed that incorporates improvements over the equipment used to infiltrate disks. A computer-controlled machine-man interface is being developed to allow for total control of all processing variables. Additionally, several improvements are being made to the furnace that will reduce the complexity and cost of the process. These improvements include the incorporation of free standing preforms, cast mandrels, and simpler graphite heating elements.

  20. Simulates the Forced-Flow Chemical Vapor Infiltration in Steady State

    Energy Science and Technology Software Center (ESTSC)

    1997-12-12

    GTCVI is a finite volume model for steady-state simulation of forced-flow chemical vapor infiltration in either Cartesian or cylindrical coordinates. The model solves energy and momentum balances simultaneously over a given domain discretized into an array of finite volume elements. The species balances and deposition rates are determined after the energy and momentum balances converge. Density-dependent preform properties are included in the model. Transient average density, backpressure, temperature gradient, and average radial deposition rates canmore » be summarized. Optimal infiltration conditions can be found by varying temperature, flow, and reactant concentration.« less

  1. Modeling of chemical vapor infiltration for ceramic composites reinforced with layered, woven fabrics

    NASA Technical Reports Server (NTRS)

    Chung, Gui-Yung; Mccoy, Benjamin J.

    1991-01-01

    A homogeneous model is developed for the chemical vapor infiltration by one-dimensional diffusion into a system of layered plies consisting of woven tows containing bundles of filaments. The model predictions of the amount of deposition and the porosity of the sample as a function of time are compared with the predictions of a recent nonhomogeneous model with aligned holes formed by the weave. The nonhomogeneous model allows for diffusion through the aligned holes, into the spaces between plies, and into the gaps around filaments; i.e., three diffusion equations apply. Relative to the nonhomogeneous results, the homogeneous model underestimates the amount of deposition, since the absence of holes and spaces allows earlier occlusion of gaps around filaments and restricts the vapor infiltration.

  2. The preparation and economics of silicon carbide matrix composites by chemical vapor infiltration

    SciTech Connect

    Roman, Y.G.; Stinton, D.P.

    1995-10-01

    This paper describes a number of processing techniques that are currently in use for the development and production of continuous fiber reinforced ceramic composite materials. The limited number of available processing routes are compared with respect to the resulting material properties. As it appears the Chemical Vapor Infiltration technique is one of the most extensively developed methods. During the last decade, at least five different modifications of the isobaric isothermal CVI principle have been developed; each route having its own benefits. CVI techniques have now been developed to the extent that industrial commercialization is being realized. Projected cost aspects of the various CVI manufacturing techniques have been examined and compared.

  3. Nextel{trademark}/SiC composites fabricated using forced chemical vapor infiltration

    SciTech Connect

    Weaver, B.L.; Lowden, R.A.; McLaughlin, J.C.; Stinton, D.P.; Besmann, T.M.; Schwarz, O.J.

    1993-06-01

    Oxide fiber-reinforced silicon carbide matrix composites were fabricated employing the forced-flow, thermal gradient chemical vapor infiltration (FCVI) process. Composites using Nextel{sup TM} fibers of varying composition were prepared to investigate the effectiveness of each Nextel{sup TM} fiber as a reinforcement for the given matrix. A carbon interface coating was used for the baseline materials, however, alternate interlayers with improved oxidation resistance were also explored Room-temperature flexure strengths of as-fabricated composites and specimens heated in air at 1273 K were measured and compared to results for other SiC-matrix composites.

  4. Finite volume model for forced flow/thermal gradient chemical vapor infiltration

    SciTech Connect

    Starr, T.L.; Smith, A.W.

    1991-03-01

    The forced flow/thermal gradient chemical vapor infiltration process (FCVI) has proven to be a successfully technique for fabrication of ceramic matrix composites. It is particularly attractive for thick components which cannot be fabricated using the conventional, isothermal method (ICVI). Although it offers processing times that are at least an order of magnitude shorter than ICVI, FCVI has not been used to fabricate parts of complex geometry and is perceived by many to be unsuitable for such components. The major concern is that selection and control of the flow pattern and thermal profile for optimum infiltration can be a difficult and costly exercise. In order to reduce this effort, we are developing a computer model for FCVI that simulates the densification process for given component geometry, reactor configuration and operating parameters. Used by a process engineer, this model can dramatically reduce the experimental effort needed to obtain uniform densification.

  5. Finite-volume model for chemical vapor infiltration incorporating radiant heat transfer. Interim report

    SciTech Connect

    Smith, A.W.; Starr, T.L.

    1995-05-01

    Most finite-volume thermal models account for the diffusion and convection of heat and may include volume heating. However, for certain simulation geometries, a large percentage of heat flux is due to thermal radiation. In this paper a finite-volume computational procedure for the simulation of heat transfer by conduction, convection and radiation in three dimensional complex enclosures is developed. The radiant heat transfer is included as a source term in each volume element which is derived by Monte Carlo ray tracing from all possible radiating and absorbing faces. The importance of radiative heat transfer is illustrated in the modeling of chemical vapor infiltration (CVI) of tubes. The temperature profile through the tube preform matches experimental measurements only when radiation is included. An alternative, empirical approach using an {open_quotes}effective{close_quotes} thermal conductivity for the gas space can match the initial temperature profile but does not match temperature changes that occur during preform densification.

  6. Thermal expansion of laminated, woven, continuous ceramic fiber/chemical-vapor-infiltrated silicon carbide matrix composites

    NASA Technical Reports Server (NTRS)

    Eckel, Andrew J.; Bradt, Richard C.

    1990-01-01

    Thermal expansions of three two-dimensional laminate, continuous fiber/chemical-vapor-infiltrated silicon carbide matrix composites reinforced with either FP-Alumina (alumina), Nextel (mullite), or Nicalon (Si-C-O-N) fibers are reported. Experimental thermal expansion coefficients parallel to a primary fiber orientation were comparable to values calculated by the conventional rule-of-mixtures formula, except for the alumina fiber composite. Hysteresis effects were also observed during repeated thermal cycling of that composite. Those features were attributed to reoccurring fiber/matrix separation related to the micromechanical stresses generated during temperature changes and caused by the large thermal expansion mismatch between the alumina fibers and the silicon carbide matrix.

  7. Chemical vapor infiltration of TiB{sub 2} fibrous composites

    SciTech Connect

    Besmann, T.M.

    1997-04-01

    This program is designed to develop a Hall-Heroult aluminum smelting cathode with substantially improved properties. The carbon cathodes in current use require significant anode-to-cathode spacing in order to prevent shorting, causing significant electrical inefficiencies. This is due to the non-wettability of carbon by aluminum which causes instability in the cathodic aluminum pad. It is suggested that a fiber reinforced-TiB{sub 2} matrix composite would have the requisite wettability, strength, strain-to-failure, cost, and lifetime to solve this problem. The approach selected to fabricate such a cathode material is chemical vapor infiltration (CVI). This process produces high purity matrix TiB{sub 2} without damaging the relatively fragile fibers. The program is designed to evaluate potential fiber reinforcements, fabricate test specimens, and scale the process to provide demonstration components.

  8. Forced chemical vapor infiltration of tubular geometries: Modeling, design, and scale-up

    SciTech Connect

    Stinton, D.P.; Besmann, T.M.; Matlin, W.M.

    1995-06-01

    In advanced indirectly fired coal combustion systems and externally fired combined cycle concepts, ceramic heat exchangers are required to transfer heat from the hot combustion gases to the clean air that drives the gas turbines. For high efficiencies, the temperature of the turbine inlet needs to exceed 1100{degrees}C and preferably be about 1260{degrees}C. The heat exchangers will operate under pressure and experience thermal and mechanical stresses during heating and cooling, and some transients will be severe under upset conditions. Silicon carbide-matrix composites are promising for such applications because of their high strength at elevated temperature, light weight, thermal and mechanical resistance, damage tolerance, and oxidation and corrosion resistance. Fiber-reinforced composite tubes of several fiber architectures were fabricated by forced chemical vapor infiltration (FCVI) and characterized. Unfortunately, long times ({approximately}150 hours) were required to thoroughly density the tubes. An objective of the current investigation was to optimize the forced CVI process so that composite tubes could be fabricated in much shorter times. To aid in such optimization, a computer code which models the CVI process was used to identify critical process parameters. Finally, successful demonstration of the utility of composite tubes for these applications will require the testing of near-full scale components. As a result a new infiltration system was designed and constructed to prepare 10-cm diameter tubes, and is described in this report.

  9. Expedient Respiratory and Physical Protection: Does a Wet Towel Work to Prevent Chemical Warfare Agent Vapor Infiltration?

    SciTech Connect

    Sorensen, J.H.

    2002-08-30

    The purpose of this paper is to examine the effectiveness of expedient protection strategies to reduce exposure to vapors from chemical warfare agents. This includes an examination of the physical and the psychological effectiveness of measures such as using a wet towel to seal a door jam against the infiltration of chemicals while sheltering in place or to provide expedient respiratory protection. Respiratory protection for civilians has never been considered a viable option for population protection in the CSEPP. Problems of storage, ability to effectively don respirators, and questionable fit have been primary factors in rejecting this option. Expedient respiratory protection seems to offer little benefits for population protection for chemical agent vapors. Furthermore, using wet towels as a vapor barrier at the bottom of a door should be discouraged. The wetted towel provides no vapor filtration and its effectiveness in infiltration reduction is unknown. Taping the bottom of the door will still likely provide greater infiltration reduction and is recommended as the current method for use in sheltering.

  10. Aligned Carbon Nanotube Reinforced Silicon Carbide Composites by Chemical Vapor Infiltration

    SciTech Connect

    Gu, Zhan Jun; Yang, Ying Chao; Li, Kai Yuan; Tao, Xin Yong; Eres, Gyula; Howe, Jane Y; Zhang, Li Tong; Li, Xiao Dong; Pan, Zhengwei

    2011-01-01

    Owing to their exceptional stiffness and strength1 4, carbon nanotubes (CNTs) have long been considered to be an ideal reinforcement for light-weight, high-strength, and high-temperature-resistant ceramic matrix composites (CMCs)5 10. However, the research and development in CNT-reinforced CMCs have been greatly hindered due to the challenges related to manufacturing including poor dispersion, damages during dispersion, surface modification, densification and sintering, weak tube/matrix interfaces, and agglomeration of tubes at the matrix grain boundaries5,11. Here we report the fabrication of high-quality aligned CNT/SiC composites by chemical vapor infiltration (CVI), a technique that is being widely used to fabricate commercial continuous-filament CMCs12 15. Using the CVI technique most of the challenges previously encountered in the fabrication of CNT composites were readily overcome. Nanotube pullouts, an important toughening mechanism for CMCs, were consistently observed on all fractured CNT/SiC samples. Indeed, three-point bending tests conducted on individual CNT/SiC nanowires (diameters: 50 200 nm) using an atomic force microscope show that the CNT-reinforced SiC nanowires are about an order of magnitude tougher than the bulk SiC. The tube/matrix interface is so intimate and the SiC matrix is so dense that a ~50-nm-thick SiC coating can effectively protect the inside nanotubes from being oxidized at 1600 C in air. The CVI method may be extended to produce nanotube composites from a variety of matrix

  11. Structure and properties of braided sleeve preforms for chemical vapor infiltration

    SciTech Connect

    Starr, T.L.; Fiadzo, O.G.; Hablutzel, N.

    1998-04-01

    In all composites the properties and structure of the reinforcement strongly influence the performance of the material. For some composites, however, the reinforcement also affects the fabrication process itself exerting an additional, second order influence on performance. This is the case for the chemical vapor infiltration (CVI) process for fabrication of ceramic matrix composites. In this process the matrix forms progressively as a solid deposit, first onto the fiber surfaces, then onto the previous layer of deposit, ultimately growing to fill the inter-fiber porosity. The transport of reactants to the surfaces and the evolved morphology of the matrix depend on the initial reinforcement structure. This structure can vary greatly and is controlled by such factors as fiber size and cross-section, the number of filaments and amount of twist per tow or yarn, and the weave or braid architecture. Often the choice of reinforcement is based on mechanical performance analysis or on the cost and availability of the material or on the temperature stability of the fiber. Given this choice, the composite densification process--CVI--must be optimized to attain a successful material. Ceramic fiber in the form of cylindrical braided sleeve is an attractive choice for fabrication of tube-form ceramic matrix composites. Multiple, concentric layers of sleeve can be placed over a tubular mandrel, compressed and fixed with a binder to form a freestanding tube preform. This fiber architecture is different than that created by layup of plain weave cloth--the material used in most previous CVI development. This report presents the results of the investigation of CVI densification of braided sleeve preforms and the evolution of their structure and transport properties during processing.

  12. Rapid processing of carbon-carbon composites by forced flow-thermal gradient chemical vapor infiltration (FCVI)

    SciTech Connect

    Vaidyaraman, S.; Lackey, W.J.; Agrawal, P.K.; Freeman, G.B.; Langman, M.D.

    1995-10-01

    Carbon fiber-carbon matrix composites were fabricated using the forced flow-thermal gradient chemical vapor infiltration (FCVI) process. Preforms were prepared by stacking 40 layers of plain weave carbon cloth in a graphite holder. The preforms were infiltrated using propylene, propane, and methane. The present work showed that the FCVI process is well suited for fabricating carbon-carbon composites; without optimization of the process, the authors have achieved uniform and thorough densification. Composites with porosities as low as 7% were fabricated in 8--12 h. The highest deposition rate obtained in the present study was {approximately}3 {micro}m/h which is more than an order of magnitude faster than the typical value of 0.1--0.25 {micro}m/h for the isothermal process. It was also found that the use of propylene and propane as reagents resulted in faster infiltration compared to methane.

  13. Chemical-vapor-infiltrated silicon nitride, boron nitride, and silicon carbide matrix composites

    SciTech Connect

    Ventri, R.D.; Galasso, F.S. )

    1990-07-01

    This paper reports composites of carbon/chemical-vapor-deposited (CVD) Si{sub 3}N{sub 4}, carbon/CVD BN, mullite/CVD SiC, and SiC yarn/CVD SiC prepared to determine if there were inherent toughness in these systems. The matrices were deposited at high enough temperatures to ensure that they were crystalline, which should make them more stable at high temperatures. The fiber-matrix bonding in the C/Si{sub 3}N{sub 4} composite appeared to be too strong; the layers of BN in the matrix of the C/BN were too weakly bonded; and the mullite/SiC composite was not as tough as the SiC/SiC composites. Only the SiC yarn/CVD SiC composite exhibited both strength and toughness.

  14. Strength distribution of reinforcing fibers in a Nicalon fiber/chemically vapor infiltrated silicon carbide matrix composite

    NASA Technical Reports Server (NTRS)

    Eckel, Andrew J.; Bradt, Richard C.

    1989-01-01

    The strength distribution of fibers within a two-dimensional laminate ceramic/ceramic composite consisting of an eight harness satin weave of Nicalon continuous fiber within a chemically vapor infiltrated SiC matrix was determined from analysis of the fracture mirrors of the fibers. Comparison of the fiber strengths and the Weibull moduli with those for Nicalon fibers prior to incorporation into composites suggests that possible fiber damage may occur either during the weaving or during another stage of the composite manufacture. Observations also indicate that it is the higher-strength fibers which experience the greatest extent of fiber pullout and thus make a larger contribution to the overall composite toughness than do the weaker fibers.

  15. Growth mechanism of thin films of yttria-stabilized zirconia by chemical vapor infiltration using NiO-ceria substrate as oxygen source

    NASA Astrophysics Data System (ADS)

    Kikuchi, Kenji; Okada, Koji; Mineshige, Atsushi

    The deposition of yttria-stabilized zirconia films on a NiO-ceria substrate by chemical vapor infiltration (CVI) using ZrCl 4 and YCl 3 as metal sources and NiO-ceria as oxygen source was studied. The resultant films were cubic YSZ with a Y 2O 3 content of 3.7-4.2 mol%, and were transparent and strong. A NiO content of NiO-ceria above 60 mol% increases the growth rate of the YSZ film from about 5 to 25 μm over 2 h, indicating that chemical vapor deposition (CVD) occurred in addition to electrochemical vapor deposition (EVD), whereas NiO contents below 60 mol% does not affect the growth rate, indicating that only electrochemical vapor deposition occurred. The growth mechanism of the YSZ film is determined and a YSZ thin film is successfully fabricated on NiO-ceria to improve mechanical strength.

  16. A novel procedure to obtain nanocrystalline diamond/porous silicon composite by chemical vapor deposition/infiltration processes.

    PubMed

    Miranda, C R B; Azevedo, A F; Baldan, M R; Beloto, A F; Ferreira, N G

    2009-06-01

    Nanocrystalline diamond (NCD) films were formed on porous silicon (PS) substrate by Chemical Vapor Deposition/Infiltration (CVD/CVI) process using a hot filament reactor. This innovative procedure is determinant to grow a controlled three-dimensional diamond structure with diamond grains formation in the pores, covering uniformly the different growth planes. In this CVI process, a piece of reticulated vitreous carbon (RVC) was used, under de PS substrate, as an additional solid source of hydrocarbon that ensures the production of pertinent carbon growth species directly on PS and into its pores. PS substrates were obtained by anodization etching process of n-type silicon wafer in a hydrofluoric acid (HF) solution containing acetonitrile (CH3CN) which result in an uniform and well controlled porous distribution and size when compared with the usual ethanol solution. Depositions were performed using Ar-H2-CH4 where the methane concentration varied from 0 up to 1.0 vol%, to analyze the influence of RVC use as an additional carbon source on growth mechanism. Scanning Electron Microscopy (SEM) and Field Emission Gun (FEG) were used to investigate PS and NCD film morphology. SEM images of NCD showed faceted nanograins with average size from 5 to 16 nm and uniform surface texture covering all the supports among the pores resulting in an apparent micro honeycomb structure. Raman spectra confirmed the existence of sp2-bonded carbon at the grain boundaries. The spectra showed a peak that may be deconvoluted in two components at 1332 cm(-1) (diamond) and 1345 cm(-1) (D band). Two shoulders at 1150 and 1490 cm(-1) also appear and are assigned to transpolyacetylene (TPA) segments at the grain boundaries of NCD surfaces. In addition, X-ray diffraction analyses of all films presented characteristic diamond diffraction peaks corresponding to (111), (220) and (311). PMID:19504935

  17. Chemical vapor deposition growth

    NASA Technical Reports Server (NTRS)

    Ruth, R. P.; Manasevit, H. M.; Kenty, J. L.; Moudy, L. A.; Simpson, W. I.; Yang, J. J.

    1976-01-01

    A chemical vapor deposition (CVD) reactor system with a vertical deposition chamber was used for the growth of Si films on glass, glass-ceramic, and polycrystalline ceramic substrates. Silicon vapor was produced by pyrolysis of SiH4 in a H2 or He carrier gas. Preliminary deposition experiments with two of the available glasses were not encouraging. Moderately encouraging results, however, were obtained with fired polycrystalline alumina substrates, which were used for Si deposition at temperatures above 1,000 C. The surfaces of both the substrates and the films were characterized by X-ray diffraction, reflection electron diffraction, scanning electron microscopy optical microscopy, and surface profilometric techniques. Several experiments were conducted to establish baseline performance data for the reactor system, including temperature distributions on the sample pedestal, effects of carrier gas flow rate on temperature and film thickness, and Si film growth rate as a function of temperature.

  18. Chemical vapor deposition growth

    NASA Technical Reports Server (NTRS)

    Ruth, R. P.; Manasevit, H. M.; Kenty, J. L.; Moudy, L. A.; Simpson, W. I.; Yang, J. J.

    1976-01-01

    The chemical vapor deposition (CVD) method for the growth of Si sheet on inexpensive substrate materials is investigated. The objective is to develop CVD techniques for producing large areas of Si sheet on inexpensive substrate materials, with sheet properties suitable for fabricating solar cells meeting the technical goals of the Low Cost Silicon Solar Array Project. Specific areas covered include: (1) modification and test of existing CVD reactor system; (2) identification and/or development of suitable inexpensive substrate materials; (3) experimental investigation of CVD process parameters using various candidate substrate materials; (4) preparation of Si sheet samples for various special studies, including solar cell fabrication; (5) evaluation of the properties of the Si sheet material produced by the CVD process; and (6) fabrication and evaluation of experimental solar cell structures, using standard and near-standard processing techniques.

  19. Chemical vapor deposition sciences

    SciTech Connect

    1992-12-31

    Chemical vapor deposition (CVD) is a widely used method for depositing thin films of a variety of materials. Applications of CVD range from the fabrication of microelectronic devices to the deposition of protective coatings. New CVD processes are increasingly complex, with stringent requirements that make it more difficult to commercialize them in a timely fashion. However, a clear understanding of the fundamental science underlying a CVD process, as expressed through computer models, can substantially shorten the time required for reactor and process development. Research scientists at Sandia use a wide range of experimental and theoretical techniques for investigating the science of CVD. Experimental tools include optical probes for gas-phase and surface processes, a range of surface analytic techniques, molecular beam methods for gas/surface kinetics, flow visualization techniques and state-of-the-art crystal growth reactors. The theoretical strategy uses a structured approach to describe the coupled gas-phase and gas-surface chemistry, fluid dynamics, heat and mass transfer of a CVD process. The software used to describe chemical reaction mechanisms is easily adapted to codes that model a variety of reactor geometries. Carefully chosen experiments provide critical information on the chemical species, gas temperatures and flows that are necessary for model development and validation. This brochure provides basic information on Sandia`s capabilities in the physical and chemical sciences of CVD and related materials processing technologies. It contains a brief description of the major scientific and technical capabilities of the CVD staff and facilities, and a brief discussion of the approach that the staff uses to advance the scientific understanding of CVD processes.

  20. Chemical vapor deposition growth

    NASA Technical Reports Server (NTRS)

    Ruth, R. P.; Manasevit, H. M.; Campbell, A. G.; Johnson, R. E.; Kenty, J. L.; Moudy, L. A.; Shaw, G. L.; Simpson, W. I.; Yang, J. J.

    1978-01-01

    The objective was to investigate and develop chemical vapor deposition (CVD) techniques for the growth of large areas of Si sheet on inexpensive substrate materials, with resulting sheet properties suitable for fabricating solar cells that would meet the technical goals of the Low Cost Silicon Solar Array Project. The program involved six main technical tasks: (1) modification and test of an existing vertical-chamber CVD reactor system; (2) identification and/or development of suitable inexpensive substrate materials; (3) experimental investigation of CVD process parameters using various candidate substrate materials; (4) preparation of Si sheet samples for various special studies, including solar cell fabrication; (5) evaluation of the properties of the Si sheet material produced by the CVD process; and (6) fabrication and evaluation of experimental solar cell structures, using impurity diffusion and other standard and near-standard processing techniques supplemented late in the program by the in situ CVD growth of n(+)/p/p(+) sheet structures subsequently processed into experimental cells.

  1. Microwave and RF assisted chemical vapor infiltration

    SciTech Connect

    Devlin, D.J.; Barbero, R.S.

    1995-05-01

    Work during this reporting period has focused on the development of a CVI technique for rapid production of carbon/carbon and alumina composite systems. The focus of the alumina effort is towards porous materials for membrane supports and hot gas filtration. Industrial interest in these applications include companies such as: Dow, Westinghouse, Amoco and DuPont. Applications for the carbon materials are numerous and include: brakes, sporting goods, biomedical materials, flaps and seals for thrust control, after burner nozzles, turbine engine flaps and rotors. This effort will focus on aircraft brakes. A collaboration is underway with Hitco a major producer of carbon/carbon materials.

  2. Simple Chemical Vapor Deposition Experiment

    ERIC Educational Resources Information Center

    Pedersen, Henrik

    2014-01-01

    Chemical vapor deposition (CVD) is a process commonly used for the synthesis of thin films for several important technological applications, for example, microelectronics, hard coatings, and smart windows. Unfortunately, the complexity and prohibitive cost of CVD equipment makes it seldom available for undergraduate chemistry students. Here, a…

  3. Chemical vapor deposition of sialon

    DOEpatents

    Landingham, R.L.; Casey, A.W.

    A laminated composite and a method for forming the composite by chemical vapor deposition are described. The composite includes a layer of sialon and a material to which the layer is bonded. The method includes the steps of exposing a surface of the material to an ammonia containing atmosphere; heating the surface to at least about 1200/sup 0/C; and impinging a gas containing N/sub 2/, SiCl/sub 4/, and AlCl/sub 3/ on the surface.

  4. Comparison of precursor infiltration into polymer thin films via atomic layer deposition and sequential vapor infiltration using in-situ quartz crystal microgravimetry

    SciTech Connect

    Padbury, Richard P.; Jur, Jesse S.

    2014-07-01

    Previous research exploring inorganic materials nucleation behavior on polymers via atomic layer deposition indicates the formation of hybrid organic–inorganic materials that form within the subsurface of the polymer. This has inspired adaptations to the process, such as sequential vapor infiltration, which enhances the diffusion of organometallic precursors into the subsurface of the polymer to promote the formation of a hybrid organic–inorganic coating. This work highlights the fundamental difference in mass uptake behavior between atomic layer deposition and sequential vapor infiltration using in-situ methods. In particular, in-situ quartz crystal microgravimetry is used to compare the mass uptake behavior of trimethyl aluminum in poly(butylene terephthalate) and polyamide-6 polymer thin films. The importance of trimethyl aluminum diffusion into the polymer subsurface and the subsequent chemical reactions with polymer functional groups are discussed.

  5. Sensitivity of porous silicon rugate filters for chemical vapor detection

    NASA Astrophysics Data System (ADS)

    Salem, M. S.; Sailor, M. J.; Fukami, K.; Sakka, T.; Ogata, Y. H.

    2008-04-01

    The characteristics of chemical vapor sensors constructed from porous Si rugate filters are examined. The peak position of the resonant wavelength exhibits a redshift response upon exposure to ethanol vapors. The filter response scales with the vapor partial pressure; the concentration level is estimated based on theoretical calculations. The formation of two stacked rugate filters with similar index contrast but different periodicities is used to test the extent of liquid infiltration into each individual filter. The penetration length of the condensate is found to be comparable to the thickness of the filter; in a 11.3-μm-thick filter, a steady-state response is achieved in 4min.

  6. Chemical vapor deposition of sialon

    DOEpatents

    Landingham, Richard L.; Casey, Alton W.

    1982-01-01

    A laminated composite and a method for forming the composite by chemical vapor deposition. The composite includes a layer of sialon and a material to which the layer is bonded. The method includes the steps of exposing a surface of the material to an ammonia containing atmosphere; heating the surface to at least about 1200.degree. C.; and impinging a gas containing in a flowing atmosphere of air N.sub.2, SiCl.sub.4, and AlCl.sub.3 on the surface.

  7. Thickness limitations in carbon nanotube reinforced silicon nitride coatings synthesized by vapor infiltration

    SciTech Connect

    Eres, Gyula

    2012-01-01

    Chemical vapor infiltration is a convenient method for synthesizing carbon nanotube (CNT)-reinforced ceramic coatings. The thickness over which infiltration is relatively uniform is limited by gas phase diffusion in the pore structure. These effects were investigated in two types of silicon nitride matrix composites. With CNTs that were distributed uniformly on the substrate surface dense coatings were limited to thicknesses of several microns. With dual structured CNT arrays produced by photolithography coatings up to 400 gm thick were obtained with minimal residual porosity. Gas transport into these dual structured materials was facilitated by creating micron sized channels between "CNT pillars" (i.e. each pillar consisted of a large number of individual CNTs). The experimental results are consistent with basic comparisons between the rates of gas diffusion and silicon nitride growth in porous structures. This analysis also provides a general insight into optimizing infiltration conditions during the fabrication of thick CNT-reinforced composite coatings. (C) 2012 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

  8. Atmospheric pressure synthesis of photoluminescent hybrid materials by sequential organometallic vapor infiltration into polyethylene terephthalate fibers

    SciTech Connect

    Akyildiz, Halil I.; Mousa, Moataz Bellah M.; Jur, Jesse S.

    2015-01-28

    Exposing a polymer to sequential organometallic vapor infiltration (SVI) under low pressure conditions can significantly modify the polymer's chemical, mechanical, and optical properties. We demonstrate that SVI of trimethylaluminum into polyethylene terephthalate (PET) can also proceed readily at atmospheric pressure, and at 60 °C the extent of reaction determined by mass uptake is independent of pressure between 2.5 Torr and 760 Torr. At 120 °C, however, the mass gain is 50% larger at 2.5 Torr relative to that at 760 Torr, indicating that the precursor diffusion in the chamber and fiber matrix decreases at higher source pressure. Mass gain decreases, in general, as the SVI process temperature increases both at 2.5 Torr and 760 Torr attributed to the faster reaction kinetics forming a barrier layer, which prevents further diffusion of the reactive species. The resulting PET/Al-O{sub x} product shows high photoluminescence compared to untreated fibers. A physical mask on the polymer during infiltration at 760 Torr is replicated in the underlying polymer, producing an image in the polymer that is visible under UV illumination. Because of the reduced precursor diffusivity during exposure at 760 Torr, the image shows improved resolution compared to SVI performed under typical 2.5 Torr conditions.

  9. Photoluminescence Mechanism and Photocatalytic Activity of Organic-Inorganic Hybrid Materials Formed by Sequential Vapor Infiltration.

    PubMed

    Akyildiz, Halil I; Stano, Kelly L; Roberts, Adam T; Everitt, Henry O; Jur, Jesse S

    2016-05-01

    Organic-inorganic hybrid materials formed by sequential vapor infiltration (SVI) of trimethylaluminum into polyester fibers are demonstrated, and the photoluminescence of the fibers is evaluated using a combined UV-vis and photoluminescence excitation (PLE) spectroscopy approach. The optical activity of the modified fibers depends on infiltration thermal processing conditions and is attributed to the reaction mechanisms taking place at different temperatures. At low temperatures a single excitation band and dual emission bands are observed, while, at high temperatures, two distinct absorption bands and one emission band are observed, suggesting that the physical and chemical structure of the resulting hybrid material depends on the SVI temperature. Along with enhancing the photoluminescence intensity of the PET fibers, the internal quantum efficiency also increased to 5-fold from ∼4-5% to ∼24%. SVI processing also improved the photocatalytic activity of the fibers, as demonstrated by photodeposition of Ag and Au metal particles out of an aqueous metal salt solution onto fiber surfaces via UVA light exposure. Toward applications in flexible electronics, well-defined patterning of the metallic materials is achieved by using light masking and focused laser rastering approaches. PMID:27063955

  10. Chemical vapor deposition coating for micromachines

    SciTech Connect

    MANI,SEETHAMBAL S.; FLEMING,JAMES G.; SNIEGOWSKI,JEFFRY J.; DE BOER,MAARTEN P.; IRWIN,LAWRENCE W.; WALRAVEN,JEREMY A.; TANNER,DANELLE M.; DUGGER,MICHAEL T.

    2000-04-21

    Two major problems associated with Si-based MEMS devices are stiction and wear. Surface modifications are needed to reduce both adhesion and friction in micromechanical structures to solve these problems. In this paper, the authors will present a process used to selectively coat MEMS devices with tungsten using a CVD (Chemical Vapor Deposition) process. The selective W deposition process results in a very conformal coating and can potentially solve both stiction and wear problems confronting MEMS processing. The selective deposition of tungsten is accomplished through silicon reduction of WF{sub 6}, which results in a self-limiting reaction. The selective deposition of W only on polysilicon surfaces prevents electrical shorts. Further, the self-limiting nature of this selective W deposition process ensures the consistency necessary for process control. Selective tungsten is deposited after the removal of the sacrificial oxides to minimize process integration problems. This tungsten coating adheres well and is hard and conducting, requirements for device performance. Furthermore, since the deposited tungsten infiltrates under adhered silicon parts and the volume of W deposited is less than the amount of Si consumed, it appears to be possible to release stuck parts that are contacted over small areas such as dimples. Results from tungsten deposition on MEMS structures with dimples will be presented. The effect of wet and vapor phase cleanings prior to the deposition will be discussed along with other process details. The W coating improved wear by orders of magnitude compared to uncoated parts. Tungsten CVD is used in the integrated-circuit industry, which makes this approach manufacturable.

  11. HANFORD CHEMICAL VAPORS WORKER CONCERNS & EXPOSURE EVALUATION

    SciTech Connect

    ANDERSON, T.J.

    2006-12-20

    Chemical vapor emissions from underground hazardous waste storage tanks on the Hanford site in eastern Washington State are a potential concern because workers enter the tank farms on a regular basis for waste retrievals, equipment maintenance, and surveillance. Tank farm contractors are in the process of retrieving all remaining waste from aging single-shell tanks, some of which date to World War II, and transferring it to newer double-shell tanks. During the waste retrieval process, tank farm workers are potentially exposed to fugitive chemical vapors that can escape from tank headspaces and other emission points. The tanks are known to hold more than 1,500 different species of chemicals, in addition to radionuclides. Exposure assessments have fully characterized the hazards from chemical vapors in half of the tank farms. Extensive sampling and analysis has been done to characterize the chemical properties of hazardous waste and to evaluate potential health hazards of vapors at the ground surface, where workers perform maintenance and waste transfer activities. Worker concerns. risk communication, and exposure assessment are discussed, including evaluation of the potential hazards of complex mixtures of chemical vapors. Concentrations of vapors above occupational exposure limits-(OEL) were detected only at exhaust stacks and passive breather filter outlets. Beyond five feet from the sources, vapors disperse rapidly. No vapors have been measured above 50% of their OELs more than five feet from the source. Vapor controls are focused on limited hazard zones around sources. Further evaluations of vapors include analysis of routes of exposure and thorough analysis of nuisance odors.

  12. Low-pressure, chemical vapor deposition polysilicon

    NASA Technical Reports Server (NTRS)

    Gallagher, B. D.; Crotty, G. C.

    1986-01-01

    The low-pressure chemical vapor deposition (LPCVD) of polycrystalline silicon was investigted. The physical system was described, as was the controlling process parameters and requirements for producing films for use as an integral portion of the solar cell contact system.

  13. Chemical vapor deposition of mullite coatings

    DOEpatents

    Sarin, Vinod; Mulpuri, Rao

    1998-01-01

    This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.

  14. Numerical modeling tools for chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Jasinski, Thomas J.; Childs, Edward P.

    1992-01-01

    Development of general numerical simulation tools for chemical vapor deposition (CVD) was the objective of this study. Physical models of important CVD phenomena were developed and implemented into the commercial computational fluid dynamics software FLUENT. The resulting software can address general geometries as well as the most important phenomena occurring with CVD reactors: fluid flow patterns, temperature and chemical species distribution, gas phase and surface deposition. The physical models are documented which are available and examples are provided of CVD simulation capabilities.

  15. The chemical vapor synthesis of inorganic nanopowders

    NASA Astrophysics Data System (ADS)

    Sohn, Hong Yong; Ryu, Taegong; Choi, Jin Won; Hwang, Kyu Sup; Han, Gilsoo; Choi, Young Joon; Fang, Zhigang Zak

    2007-12-01

    Chemical vapor synthesis (CVS) is a process for making fine solid particles by the vapor-phase chemical reactions of precursors. At the University of Utah, this process has been applied to the synthesis of the aluminides of titanium and nickel, other metallic and intermetallic powders, and subsequently aluminum nanopowder and WC-Co nanocomposite powder. This work has demonstrated that it is possible to prepare fine particles of 5-200 nm size by CVS. Further, it has been shown that this technique has a unique capability to produce uniformly mixed powders of different solids. This is possible because the reactants are perfectly mixed in the gas phase. More recently, the CVS process has been carried out in a plasma reactor. This system has shown considerable promise for many applications as a method of producing nanosized powders.

  16. Making Ceramic Fibers By Chemical Vapor

    NASA Technical Reports Server (NTRS)

    Revankar, Vithal V. S.; Hlavacek, Vladimir

    1994-01-01

    Research and development of fabrication techniques for chemical vapor deposition (CVD) of ceramic fibers presented in two reports. Fibers of SiC, TiB2, TiC, B4C, and CrB2 intended for use as reinforcements in metal-matrix composite materials. CVD offers important advantages over other processes: fibers purer and stronger and processed at temperatures below melting points of constituent materials.

  17. Silicon refinement by chemical vapor transport

    NASA Technical Reports Server (NTRS)

    Olson, J.

    1984-01-01

    Silicon refinement by chemical vapor transport is discussed. The operating characteristics of the purification process, including factors affecting the rate, purification efficiency and photovoltaic quality of the refined silicon were studied. The casting of large alloy plates was accomplished. A larger research scale reactor is characterized, and it is shown that a refined silicon product yields solar cells with near state of the art conversion efficiencies.

  18. Chemical-Vapor-Deposited Diamond Film

    NASA Technical Reports Server (NTRS)

    Miyoshi, Kazuhisa

    1999-01-01

    This chapter describes the nature of clean and contaminated diamond surfaces, Chemical-vapor-deposited (CVD) diamond film deposition technology, analytical techniques and the results of research on CVD diamond films, and the general properties of CVD diamond films. Further, it describes the friction and wear properties of CVD diamond films in the atmosphere, in a controlled nitrogen environment, and in an ultra-high-vacuum environment.

  19. Chemical vapor deposition of epitaxial silicon

    DOEpatents

    Berkman, Samuel

    1984-01-01

    A single chamber continuous chemical vapor deposition (CVD) reactor is described for depositing continuously on flat substrates, for example, epitaxial layers of semiconductor materials. The single chamber reactor is formed into three separate zones by baffles or tubes carrying chemical source material and a carrier gas in one gas stream and hydrogen gas in the other stream without interaction while the wafers are heated to deposition temperature. Diffusion of the two gas streams on heated wafers effects the epitaxial deposition in the intermediate zone and the wafers are cooled in the final zone by coolant gases. A CVD reactor for batch processing is also described embodying the deposition principles of the continuous reactor.

  20. Chemical Vapor Synthesis of Nanocrystalline Oxides

    NASA Astrophysics Data System (ADS)

    Djenadic, Ruzica; Winterer, Markus

    The generation of nanoparticles in the gas phase by Chemical Vapor Synthesis (CVS) may be described from the point of view of chemical engineering as a sequence of unit operations among which reactant delivery, reaction energy input, and product separation are key processes which determine the product characteristics and quality required by the applications of nanoparticles and powders. In case of CVS, the volatility of the reactants (precursors) may severely limit the possible type of products as well as the production rate. It is shown that these limits can be lifted by use of a laser flash evaporator which also enables the use of precursor mixtures for the production of complex oxides as shown for Co-doped ZnO and the pulsed operation to influence powder characteristics. The mode in which energy is supplied to the particle synthesis reactor has also substantial influence on particle and powder characteristics as is shown for TiO2 using different time-temperatureprofiles.

  1. Chemical Vapor Deposition Of Silicon Carbide

    NASA Technical Reports Server (NTRS)

    Powell, J. Anthony; Larkin, David J.; Matus, Lawrence G.; Petit, Jeremy B.

    1993-01-01

    Large single-crystal SiC boules from which wafers of large area cut now being produced commerically. Availability of wafers opens door for development of SiC semiconductor devices. Recently developed chemical vapor deposition (CVD) process produces thin single-crystal SiC films on SiC wafers. Essential step in sequence of steps used to fabricate semiconductor devices. Further development required for specific devices. Some potential high-temperature applications include sensors and control electronics for advanced turbine engines and automobile engines, power electronics for electromechanical actuators for advanced aircraft and for space power systems, and equipment used in drilling of deep wells. High-frequency applications include communication systems, high-speed computers, and microwave power transistors. High-radiation applications include sensors and controls for nuclear reactors.

  2. Chemical vapor deposition of group IIIB metals

    DOEpatents

    Erbil, A.

    1989-11-21

    Coatings of Group IIIB metals and compounds thereof are formed by chemical vapor deposition, in which a heat decomposable organometallic compound of the formula given in the patent where M is a Group IIIB metal, such as lanthanum or yttrium and R is a lower alkyl or alkenyl radical containing from 2 to about 6 carbon atoms, with a heated substrate which is above the decomposition temperature of the organometallic compound. The pure metal is obtained when the compound of the formula 1 is the sole heat decomposable compound present and deposition is carried out under nonoxidizing conditions. Intermetallic compounds such as lanthanum telluride can be deposited from a lanthanum compound of formula 1 and a heat decomposable tellurium compound under nonoxidizing conditions.

  3. Chemical vapor deposition of group IIIB metals

    DOEpatents

    Erbil, Ahmet

    1989-01-01

    Coatings of Group IIIB metals and compounds thereof are formed by chemical vapor deposition, in which a heat decomposable organometallic compound of the formula (I) ##STR1## where M is a Group IIIB metal, such as lanthanum or yttrium and R is a lower alkyl or alkenyl radical containing from 2 to about 6 carbon atoms, with a heated substrate which is above the decomposition temperature of the organometallic compound. The pure metal is obtained when the compound of the formula I is the sole heat decomposable compound present and deposition is carried out under nonoxidizing conditions. Intermetallic compounds such as lanthanum telluride can be deposited from a lanthanum compound of formula I and a heat decomposable tellurium compound under nonoxidizing conditions.

  4. Characterization of Metalorganic Chemical Vapor Deposition

    NASA Technical Reports Server (NTRS)

    Jesser, W. A.

    1998-01-01

    A series of experimental and numerical investigations to develop a more complete understanding of the reactive fluid dynamics of chemical vapor deposition were conducted. In the experimental phases of the effort, a horizontal CVD reactor configuration was used for the growth of InP at UVA and for laser velocimetry measurements of the flow fields in the reactor at LaRC. This horizontal reactor configuration was developed for the growth of III-V semiconductors and has been used by our research group in the past to study the deposition of both GaAs and InP. While the ultimate resolution of many of the heat and mass transport issues will require access to a reduced-gravity environment, the series of groundbased research makes direct contributions to this area while attempting to answer the design questions for future experiments of how low must gravity be reduced and for how long must this gravity level be maintained to make the necessary measurements. It is hoped that the terrestrial experiments will be useful for the design of future microgravity experiments which likely will be designed to employ a core set of measurements for applications in the microgravity environment such as HOLOC, the Fluid Physics/Dynamics Facility, or the Schlieren photography, the Laser Imaging Velocimetry and the Laser Doppler Velocimetry instruments under development for the Advanced Fluids Experiment Module.

  5. Development of chemical vapor composites, CVC materials. Final report

    SciTech Connect

    1998-10-05

    Industry has a critical need for high-temperature operable ceramic composites that are strong, non-brittle, light weight, and corrosion resistant. Improvements in energy efficiency, reduced emissions and increased productivity can be achieved in many industrial processes with ceramic composites if the reaction temperature and pressure are increased. Ceramic composites offer the potential to meet these material requirements in a variety of industrial applications. However, their use is often restricted by high cost. The Chemical Vapor composite, CVC, process can reduce the high costs and multiple fabrication steps presently required for ceramic fabrication. CVC deposition has the potential to eliminate many difficult processing problems and greatly increase fabrication rates for composites. With CVC, the manufacturing process can control the composites` density, microstructure and composition during growth. The CVC process: can grow or deposit material 100 times faster than conventional techniques; does not require an expensive woven preform to infiltrate; can use high modulus fibers that cannot be woven into a preform; can deposit composites to tolerances of less than 0.025 mm on one surface without further machining.

  6. Water quality impacts on infiltration rates and using chemical transport models as management tools

    Technology Transfer Automated Retrieval System (TEKTRAN)

    Use of low quality waters for irrigation requires improved tools for managing soil salinity, and increased knowledge of chemical effects on infiltration, plant ion uptake, and impact to ground and surface water. Impacts of irrigation water with SAR (sodium adsorption ratio) 2,4,6,8 and l0 on infiltr...

  7. Preventing Chemical-Vapor Deposition In Selected Areas

    NASA Technical Reports Server (NTRS)

    Keeley, Joseph T.; Goela, Jitendra Singh; Pickering, Michael A.; Taylor, Raymond L.

    1991-01-01

    Method for prevention of chemical-vapor deposition of material in selected areas developed. Gas shroud isolates specific area from rest of deposition system. Inert gas flowing from beneath substrate prevents deposition between substrate and outer ring. Method extremely successful in selective deposition of SiC in chemical-vapor-deposition reactor. Used in deposition of SiC mirror blanks in Large Mirror Substrate and Lidar Mirror programs. Critical element in overall chemical-vapor-deposition process for producing large, lightweight mirrors.

  8. Multiphase Reactive Transport modeling of Stable Isotope Fractionation of Infiltrating Unsaturated Zone Pore Water and Vapor Using TOUGHREACT

    SciTech Connect

    Singleton, Michael J.; Sonnenthal, Eric L.; Conrad, Mark E.; DePaolo, Donald J.

    2003-08-28

    Numerical simulations of transport and isotope fractionation provide a method to quantitatively interpret vadose zone pore water stable isotope depth profiles based on soil properties, climatic conditions, and infiltration. We incorporate the temperature-dependent equilibration of stable isotopic species between water and water vapor, and their differing diffusive transport properties into the thermodynamic database of the reactive transport code TOUGHREACT. These simulations are used to illustrate the evolution of stable isotope profiles in semiarid regions where recharge during wet seasons disturbs the drying profile traditionally associated with vadose zone pore waters. Alternating wet and dry seasons lead to annual fluctuations in moisture content, capillary pressure, and stable isotope compositions in the vadose zone. Periodic infiltration models capture the effects of seasonal increases in precipitation and predict stable isotope profiles that are distinct from those observed under drying (zero infiltration) conditions. After infiltration, evaporation causes a shift to higher 18O and D values, which are preserved in the deeper pore waters. The magnitude of the isotopic composition shift preserved in deep vadose zone pore waters varies inversely with the rate of infiltration.

  9. Worker Protection from Chemical Vapors: Hanford Tank Farms

    SciTech Connect

    Anderson, T.J.

    2007-07-01

    Chemical vapor emissions from underground hazardous waste storage tanks on the Hanford site in eastern Washington State are a potential concern because workers enter the tank farms on a regular basis for waste retrievals, equipment maintenance, and surveillance. Tank farm contractors are in the process of retrieving all remaining waste from aging single-shell tanks, some of which date to World War II, and transferring it to newer double-shell tanks. During the waste retrieval process, tank farm workers are potentially exposed to fugitive chemical vapors that can escape from tank head-spaces and other emission points. The tanks are known to hold more than 1,500 different species of chemicals, in addition to radionuclides. Exposure assessments have fully characterized the hazards from chemical vapors in half of the tank farms. Extensive sampling and analysis has been done to characterize the chemical properties of hazardous waste and to evaluate potential health hazards of vapors at the ground surface, where workers perform maintenance and waste transfer activities. Worker concerns, risk communication, and exposure assessment are discussed, including evaluation of the potential hazards of complex mixtures of chemical vapors. Concentrations of vapors above occupational exposure limits (OEL) were detected only at exhaust stacks and passive breather filter outlets. Beyond five feet from the sources, vapors disperse rapidly. No vapors have been measured above 50% of their OELs more than five feet from the source. Vapor controls are focused on limited hazard zones around sources. Further evaluations of vapors include analysis of routes of exposure and thorough analysis of nuisance odors. (authors)

  10. Chemical vapor deposition of copper films

    NASA Astrophysics Data System (ADS)

    Borgharkar, Narendra Shamkant

    We have studied the kinetics of copper chemical vapor deposition (CVD) for interconnect metallization using hydrogen (Hsb2) reduction of the Cu(hfac)sb2 (copper(II) hexafluoroacetylacetonate) precursor. Steady-state deposition rates were measured using a hot-wall microbalance reactor. For base case conditions of 2 Torr Cu(hfac)sb2, 40 Torr Hsb2, and 300sp°C, a growth rate of 0.5 mg cmsp{-2} hrsp{-1} (ca. 10 nm minsp{-1}) is observed. Reaction order experiments suggest that the deposition rate passes through a maximum at partial pressure of 2 Torr of Cu(hfac)sb2. The deposition rate has an overall half-order dependence on Hsb2 partial pressure. A Langmuir-Hinshelwood rate expression is used to describe the observed kinetic dependencies on Cu(hfac)sb2, Hsb2, and H(hfac). Based on the rate expression a mechanism is proposed in which the overall rate is determined by the surface reaction of adsorbed Cu(hfac)sb2 and H species. Additionally, the role of alcohols in enhancing the deposition rate has been investigated. Addition of isopropanol results in a six fold enhancement to yield a deposition rate of 3.3 mg cmsp{-2} hrsp{-1} (ca. 60 nm minsp{-1}) at 5 Torr of isopropanol, 0.4 Torr Cu(hfac)sb2, 40 Torr Hsb2, and 300sp°C. Ethanol and methanol give lower enhancements of 1.75 and 1.1 mg cmsp{-2} hrsp{-1}, respectively. A mechanism based on the ordering of the aqueous pKsba values of the alcohols is proposed to explain the observed results. Lastly, we have built a warm-wall Pedestal reactor apparatus to demonstrate copper CVD on TiN/Si substrates. The apparatus includes a liquid injection system for transport of isopropanol-diluted precursor solutions. At optimized conditions of precursor and substrate pre-treatments, we have deposited uniform films of copper on TiN/Si substrates at an average deposition rate of 3.0 mg cmsp{-2} hrsp{-1} (ca. 60 nm minsp{-1}).

  11. Chemical Vapor Deposition of Silicon from Silane Pyrolysis

    NASA Technical Reports Server (NTRS)

    Praturi, A. K.; Lutwack, R.; Hsu, G.

    1977-01-01

    The four basic elements in the chemical vapor deposition (CVD) of silicon from silane are analytically treated from a kinetic standpoint. These elements are mass transport of silane, pyrolysis of silane, nucleation of silicon, and silicon crystal growth. Rate expressions that describe the various steps involved in the chemical vapor deposition of silicon were derived from elementary principles. Applications of the rate expressions for modeling and simulation of the silicon CVD are discussed.

  12. Differentiation of vapor mixture with chemical sensor arrays

    NASA Astrophysics Data System (ADS)

    Kim, Chulki; Jung, Youngmo; Moon, Hi Gyu; Lee, Ji Eun; Shin, Bum Ju; Lim, Chaehyun; Choi, Jaebin; Seo, Minah; Kim, Jae Hun; Jun, Seong Chan; Kim, Sang Kyung; Kang, Chong Yun; Lee, Taikjin; Lee, Seok

    2015-07-01

    Arrays of partially selective chemical sensors have been the focus of extensive research over the past decades because of their potential for widespread application in ambient air monitoring, health and safety, and biomedical diagnostics. Especially, vapor sensor arrays based on functionalized nanomaterials have shown great promise with their high sensitivity by dimensionality and outstanding electronic properties. Here, we introduce experiments where individual vapors and mixtures of them are examined by different chemical sensor arrays. The collected data from those sensor arrays are further analyzed by a principal component analysis (PCA) and targeted vapors are recognized based on prepared database.

  13. Fabrication of full-scale fiber reinforced hot-gas filters by chemical vapor deposition. Final technical report

    SciTech Connect

    Smith, R.G.

    1994-04-01

    The goal of this program was to develop and fabricate an initial set of ceramic fiber reinforced, ceramic matrix composite, hot gas candle filters for testing in a simulated pressurized fluidized bed combustion (PFBC) environment. Four full-scale ceramic fiber reinforced candle filters were fabricated in a multi step process. The substrate was filament wound using Nextel{trademark} 312 yarn and then coated with silicon carbide by chemical vapor deposition (CVD) to form a ceramic composite shape that provides the candle`s structural shape, toughness, and strength. Filter layer material was applied over the surface and then bonded with silicon carbide in a chemical vapor infiltration, CVI, step.

  14. Chemical vapor deposition of graphene single crystals.

    PubMed

    Yan, Zheng; Peng, Zhiwei; Tour, James M

    2014-04-15

    As a two-dimensional (2D) sp(2)-bonded carbon allotrope, graphene has attracted enormous interest over the past decade due to its unique properties, such as ultrahigh electron mobility, uniform broadband optical absorption and high tensile strength. In the initial research, graphene was isolated from natural graphite, and limited to small sizes and low yields. Recently developed chemical vapor deposition (CVD) techniques have emerged as an important method for the scalable production of large-size and high-quality graphene for various applications. However, CVD-derived graphene is polycrystalline and demonstrates degraded properties induced by grain boundaries. Thus, the next critical step of graphene growth relies on the synthesis of large graphene single crystals. In this Account, we first discuss graphene grain boundaries and their influence on graphene's properties. Mechanical and electrical behaviors of CVD-derived polycrystalline graphene are greatly reduced when compared to that of exfoliated graphene. We then review four representative pathways of pretreating Cu substrates to make millimeter-sized monolayer graphene grains: electrochemical polishing and high-pressure annealing of Cu substrate, adding of additional Cu enclosures, melting and resolidfying Cu substrates, and oxygen-rich Cu substrates. Due to these pretreatments, the nucleation site density on Cu substrates is greatly reduced, resulting in hexagonal-shaped graphene grains that show increased grain domain size and comparable electrical properties as to exfoliated graphene. Also, the properties of graphene can be engineered by its shape, thickness and spatial structure. Thus, we further discuss recently developed methods of making graphene grains with special spatial structures, including snowflakes, six-lobed flowers, pyramids and hexagonal graphene onion rings. The fundamental growth mechanism and practical applications of these well-shaped graphene structures should be interesting topics and

  15. Flexible Electronics: High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells (Adv. Mater. 28/2016).

    PubMed

    He, Rongrui; Day, Todd D; Sparks, Justin R; Sullivan, Nichole F; Badding, John V

    2016-07-01

    On page 5939, J. V. Badding and co-workers describe the unrolling of a flexible hydrogenated amorphous silicon solar cell, deposited by high-pressure chemical vapor deposition. The high-pressure deposition process is represented by the molecules of silane infiltrating the small voids between the rolled up substrate, facilitating plasma-free deposition over a very large area. The high-pressure approach is expected to also find application for 3D nanoarchitectures. PMID:27442970

  16. Synthetic Graphene Grown by Chemical Vapor Deposition on Copper Foils

    NASA Astrophysics Data System (ADS)

    Chung, Ting Fung; Shen, Tian; Cao, Helin; Jauregui, Luis A.; Wu, Wei; Yu, Qingkai; Newell, David; Chen, Yong P.

    2013-04-01

    The discovery of graphene, a single layer of covalently bonded carbon atoms, has attracted intense interest. Initial studies using mechanically exfoliated graphene unveiled its remarkable electronic, mechanical and thermal properties. There has been a growing need and rapid development in large-area deposition of graphene film and its applications. Chemical vapor deposition on copper has emerged as one of the most promising methods in obtaining large-scale graphene films with quality comparable to exfoliated graphene. In this paper, we review the synthesis and characterizations of graphene grown on copper foil substrates by atmospheric pressure chemical vapor deposition. We also discuss potential applications of such large-scale synthetic graphene.

  17. Fluid infiltration into fault zones: Chemical, isotopic, and mechanical effects

    NASA Astrophysics Data System (ADS)

    Kerrich, R.

    1986-01-01

    Fluid infiltration into fault zones and their deeper-level counterparts, brittle-ductile shear zones, is examined in diverse tectonic environments. In the 2.7 Ga Abitibi greenstone belt, major tectonic discontinuities, with lateral extents of hundreds of kilometres initiated as listric normal faults accommodating rift extension and acted as sites for komatiite extrusion and locally intense metasomatism. During reverse motion on the structures, accommodating shortening of the belt, these transcrustal faults were utilised as a conduit for the ascent of trondhjemitic magmas from the base of the crust and of alkaline magmas from the asthenosphere and for the discharge of thousands of cubic kilometres of hydrothermal fluids. Such fluids were characterised by δ18O=+6±2, δD=-50±20, δ13C=-4±4, and temperatures of 270 to 450°C, probably derived from devolatilisation of crustal rocks undergoing prograde metamorphism. Hydrothermal fluids were more radiogenic (87Sr/86Sr=0.7010 to 0.7040) and possessed higher μ than did contemporaneous mantle, komatiites or tholeiites, and thus carried a contribution from older sialic basement. A provinciality of87Sr/86Sr and δ13C is evident, signifying that fault plumbing sampled lower crust which was heterogeneous at the scale of tens of kilometres. Mineralised faults possess enrichments of large ion lithophile (LIL), LIL elements, including K, Rb, Ba, Cs, B, and CO2, and rare elements, such as Au, Ag, As, Sb, Se, Te, Bi, and W. Fluids were characterised by XCO 2≈0.1, neutral to slightly acidic pH, low salinity ≤3 wt-%, K/Na=0.1, they carried minor CH4, CO, and N2, and they underwent transient effervescence of CO2 during decompression. Clastic sediments occupy graben developed at fault flexures. The40Ar/39Ar release spectra indicate that fault rocks experienced episodic disturbance on time scales of hundreds of millions of years. At the Grenville front, translation was accommodated along two mylonite zones and an intervening

  18. A novel chemically selective siloxane polymer for chemical vapor sensing

    NASA Astrophysics Data System (ADS)

    Huang, Jia; Jiang, Yadong; Du, Xiaosong; Bi, Juan

    2010-10-01

    A new hydrogen-bond acidic carbosiloxane polymer for quartz crystal microbalance sensors (QCMs) application was synthesized via O-alkylation, Claisen rearrange, hydrosilylation reaction and functionalized the polysiloxane with trifluoroacetone groups (TFA). The trifluoroisopropanol functionalized polysiloxane was characterized by FT-IR and 1HNMR. And this novel siloxane polymer was coated onto AT-cut 8 MHz QCM sensors to investigate its gas sensitive responses to the organophosphorus nerve agent stimulant dimethyl methylphosphonate (DMMP) vapor as well as other interfering organic vapors. The research work indicated that frequency shifts of the trifluoroisopropanol functionalized polysiloxane based QCM sensor to the DMMP vapor were completely linear, and with a regression coefficient of 0.9973 in the concentration range of 10-60 ppm. In addition, the sensitivity of the fabricated QCM sensors to DMMP was up to 10.64 Hz/ ppm, and much higher than the other interfering vapors, limits of detection (LODs) of the QCM sensors was 0.28 ppm, thus high selectivity to DMMP was demonstrated in this work.

  19. Vaporization of a mixed precursors in chemical vapor deposition for YBCO films

    NASA Technical Reports Server (NTRS)

    Zhou, Gang; Meng, Guangyao; Schneider, Roger L.; Sarma, Bimal K.; Levy, Moises

    1995-01-01

    Single phase YBa2Cu3O7-delta thin films with T(c) values around 90 K are readily obtained by using a single source chemical vapor deposition technique with a normal precursor mass transport. The quality of the films is controlled by adjusting the carrier gas flow rate and the precursor feed rate.

  20. Chemical vapor deposition for automatic processing of integrated circuits

    NASA Technical Reports Server (NTRS)

    Kennedy, B. W.

    1980-01-01

    Chemical vapor deposition for automatic processing of integrated circuits including the wafer carrier and loading from a receiving air track into automatic furnaces and unloading on to a sending air track is discussed. Passivation using electron beam deposited quartz is also considered.

  1. Quantitative Infrared Spectra of Vapor Phase Chemical Agents

    SciTech Connect

    Sharpe, Steven W.; Johnson, Timothy J.; Chu, P M.; Kleimeyer, J; Rowland, Brad; Gardner, Patrick J.

    2003-04-21

    Quantitative high resolution (0.1 cm -1) infrared spectra have been acquired for a number of pressure broadened (101.3 KPa N2), vapor phase chemicals including: Sarin (GB), Soman (GD), Tabun (GA), Cyclosarin (GF), VX, nitrogen mustard (HN3), sulfur mustard (HD) and Lewisite (L).

  2. Chemical-vapor deposition of silicon from silane

    NASA Technical Reports Server (NTRS)

    Hsu, G. C.; Lutwack, R.; Praturi, A. K.

    1979-01-01

    Report lists tables of standard free-energy change, equilibrium constant, and heat of reaction for chemical vapor deposition (CVD) of silicon from silane over temperature range of 100 to 1000 K. Data indicates silicon CVD may be a commercially economical process for production of silicon for solar arrays and other applications.

  3. Chemical Vapor Deposition of Aluminum Oxide Thin Films

    ERIC Educational Resources Information Center

    Vohs, Jason K.; Bentz, Amy; Eleamos, Krystal; Poole, John; Fahlman, Bradley D.

    2010-01-01

    Chemical vapor deposition (CVD) is a process routinely used to produce thin films of materials via decomposition of volatile precursor molecules. Unfortunately, the equipment required for a conventional CVD experiment is not practical or affordable for many undergraduate chemistry laboratories, especially at smaller institutions. In an effort to…

  4. Chemiluminescence chemical detection of vapors and device

    SciTech Connect

    Collins, G.E.; Rose-Pehrsson, S.L.

    1995-07-10

    A solid phase chemical sensor includes a polymer film which has a chemiluminescent reagent immobilized therein. The polymer film and chemiluminescent reagent are chosen to significantly enhance the selectivity of the sensor to the analyte in the gaseous phase to which the sensor is exposed. The sensor is then positioned so that, when exposed to the gaseous mixture, any chemiluminescence generated will be detected by a photomultiplier tube or other photoelectric device, such as a photodiode. The sensor is particularly useful in the detection of O2, N2H4, SO2, NO2, and halogenated hydrocarbons.

  5. Fabrication of a multifunctional carbon nanotube "cotton" yarn by the direct chemical vapor deposition spinning process.

    PubMed

    Zhong, Xiao-Hua; Li, Ya-Li; Feng, Jian-Min; Kang, Yan-Ru; Han, Shuai-Shuai

    2012-09-21

    A continuous cotton-like carbon nanotube fiber yarn, consisting of multiple threads of high purity double walled carbon nanotubes, was fabricated in a horizontal CVD gas flow reactor with water vapor densification by the direct chemical vapor deposition spinning process. The water vapor interaction leads to homogeneous shrinking of the CNT sock-like assembly in the gas flow. This allows well controlled continuous winding of the dense thread inside the reactor. The CNT yarn is quite thick (1-3 mm), has a highly porous structure (99%) while being mechanically strong and electrically conductive. The water vapor interaction leads to homogeneous oxidation of the CNTs, offering the yarn oxygen-functionalized surfaces. The unique structure and surface of the CNT yarn provide it multiple processing advantages and properties. It can be mechanically engineered into a dense yarn, infiltrated with polymers to form a composite and mixed with other yarns to form a blend, as demonstrated in this research. Therefore, this CNT yarn can be used as a "basic yarn" for various CNT based structural and functional applications. PMID:22864939

  6. Modelling of Laser-Enhanced Chemical Vapor Deposition

    NASA Technical Reports Server (NTRS)

    Brown, R. A.

    1985-01-01

    Research is directed at development of a detailed model of mass and heat transfer and chemical reaction in the pyrolysis of silane for the growth of thin amorphous silicon substrates incorporating laser heating of the gas phase above the film. The model will be the basis for evaluation of the relative importances of the decomposition of SiH4 in the vapor phase, mass transfer of the intermediate species, e.g., SiH2, and the evolution of hydrogen gas. Plans are also underway for developing a model for homogeneous nucleation of Si in the vapor phase to model the rate limitations observed at high gas-phase temperatures and high partial pressures of silane. Work was concentrated on an almost one-dimensional model for the coupling of the CO2 laser beam for heat transfer of the vapor phase with simple kinetic models for SiH4 decomposition and subsequent absorption of Si vapor on the substrate. Mass transfer in the vapor phase is assumed to be solely by diffusion. The role of convection in the vapor phase caused by the large changes in density in and around the center of the laser beam will be analyzed to evaluate the potential of microgravity experiments for increasing the uniformity of the film and the deposition rate.

  7. Solvent-assisted dewetting during chemical vapor deposition.

    PubMed

    Chen, Xichong; Anthamatten, Mitchell

    2009-10-01

    This study examines the use of a nonreactive solvent vapor, tert-butanol, during initiated chemical vapor deposition (iCVD) to promote polymer film dewetting. iCVD is a solventless technique to grow polymer thin films directly from gas phase feeds. Using a custom-built axisymmetric hot-zone reactor, smooth poly(methyl methacrylate) films are grown from methyl methacrylate (MMA) and tert-butyl peroxide (TBPO). When solvent vapor is used, nonequilibrium dewetted structures comprising of randomly distributed polymer droplets are observed. The length scale of observed topographies, determined using power spectral density (PSD) analysis, ranges from 5 to 100 microm and is influenced by deposition conditions, especially the carrier gas and solvent vapor flow rates. The use of a carrier gas leads to faster deposition rates and suppresses thin film dewetting. The use of solvent vapor promotes dewetting and leads to larger length scales of the dewetted features. Control over lateral length scale is demonstrated by preparation of hierarchal "bump on bump" topographies. Vapor-induced dewetting is demonstrated on silicon wafer substrate with a native oxide layer and also on hydrophobically modified substrate prepared using silane coupling. Autophobic dewetting of PMMA from SiOx/Si during iCVD is attributed to a thin film instability driven by both long-range van der Waals forces and short-range polar interactions. PMID:19670895

  8. Effect of vapor-phase oxygen on chemical vapor deposition growth of graphene

    NASA Astrophysics Data System (ADS)

    Terasawa, Tomo-o.; Saiki, Koichiro

    2015-03-01

    To obtain a large-area single-crystal graphene, chemical vapor deposition (CVD) growth on Cu is considered the most promising. Recently, the surface oxygen on Cu has been found to suppress the nucleation of graphene. However, the effect of oxygen in the vapor phase was not elucidated sufficiently. Here, we investigate the effect of O2 partial pressure (PO2) on the CVD growth of graphene using radiation-mode optical microscopy. The nucleation density of graphene decreases monotonically with PO2, while its growth rate reaches a maximum at a certain pressure. Our results indicate that PO2 is an important parameter to optimize in the CVD growth of graphene.

  9. Chemical Vapor Deposition of Turbine Thermal Barrier Coatings

    NASA Technical Reports Server (NTRS)

    Haven, Victor E.

    1999-01-01

    Ceramic thermal barrier coatings extend the operating temperature range of actively cooled gas turbine components, therefore increasing thermal efficiency. Performance and lifetime of existing ceram ic coatings are limited by spallation during heating and cooling cycles. Spallation of the ceramic is a function of its microstructure, which is determined by the deposition method. This research is investigating metalorganic chemical vapor deposition (MOCVD) of yttria stabilized zirconia to improve performance and reduce costs relative to electron beam physical vapor deposition. Coatings are deposited in an induction-heated, low-pressure reactor at 10 microns per hour. The coating's composition, structure, and response to the turbine environment will be characterized.

  10. Chemical vapor deposition reactor. [providing uniform film thickness

    NASA Technical Reports Server (NTRS)

    Chern, S. S.; Maserjian, J. (Inventor)

    1977-01-01

    An improved chemical vapor deposition reactor is characterized by a vapor deposition chamber configured to substantially eliminate non-uniformities in films deposited on substrates by control of gas flow and removing gas phase reaction materials from the chamber. Uniformity in the thickness of films is produced by having reactive gases injected through multiple jets which are placed at uniformally distributed locations. Gas phase reaction materials are removed through an exhaust chimney which is positioned above the centrally located, heated pad or platform on which substrates are placed. A baffle is situated above the heated platform below the mouth of the chimney to prevent downdraft dispersion and scattering of gas phase reactant materials.

  11. Structure and formation kinetics of MoSi{sub 2} composites formed by reactive vapor infiltration process

    SciTech Connect

    Hillig, W.B.; Broglio, M.; Ramakrishnan, R.M.; Patibandla, N.

    1995-10-01

    Reactive Vapor Infiltration is a convenient new process for producing high purity MoSi{sub 2} matrix composites by reacting compacted mixed Mo + MoSi{sub 2} powders ranging from 0 to 80 wt. % MoSi{sub 2} with H{sub 2} + SiCl{sub 4} vapors at temperatures from 1,000 to 1,400 C. Consideration must be taken of the volumetric increase that accompanies this conversion. The kinetics of the advance of the MoSi{sub 2} growth layer and the gravimetric uptake are given as a function of temperature and the composition. The parabolic growth rate constant was independent of composition at least up to 30% MoSi{sub 2} composition, but then showed a strong, linear increase with increasing MoSi{sub 2} content. There appeared to be a leveling off of rate above 70% MoSi{sub 2}. The corresponding gravimetric rate constant was relatively insensitive to the starting MoSi{sub 2} content. This behavior is at variance with a simple one-dimensional diffusive growth model. Possible reasons for this variance are offered.

  12. Temperature and exposure dependence of hybrid organic-inorganic layer formation by sequential vapor infiltration into polymer fibers.

    PubMed

    Akyildiz, Halil I; Padbury, Richard P; Parsons, Gregory N; Jur, Jesse S

    2012-11-01

    The characteristic processing behavior for growth of a conformal nanoscale hybrid organic-inorganic modification to polyamide 6 (PA6) by sequential vapor infiltration (SVI) is demonstrated. The SVI process is a materials growth technique by which exposure of organometallic vapors to a polymeric material promotes the formation of a hybrid organic-inorganic modification at the near surface region of the polymer. This work investigates the SVI exposure temperature and cycling times of sequential exposures of trimethylaluminum (TMA) on PA6 fiber mats. The result of TMA exposure is the preferential subsurface organic-inorganic growth by diffusion into the polymer and reaction with the carbonyl in PA6. Mass gain, infrared spectroscopy, and transmission electron microscopy analysis indicate enhanced materials growth and uniformity at lower processing temperatures. The inverse relationship between mass gain and exposure temperature is explained by the formation of a hybrid layer that prevents the diffusion of TMA into the polymer to react with the PA6 upon subsequent exposure cycles. As few as 10 SVI exposure cycles are observed to saturate the growth, yielding a modified thickness of ∼75 nm and mass increase of ∼14 wt %. Removal of the inherent PA6 moisture content reduces the mass gain by ∼4 wt % at low temperature exposures. The ability to understand the characteristic growth process is critical for the development of the hybrid materials fabrication and modification techniques. PMID:23050951

  13. Growth of zinc oxide by chemical vapor transport

    NASA Astrophysics Data System (ADS)

    Mikami, Makoto; Eto, Toshiaki; Wang, JiFeng; Masa, Yoshihiko; Isshiki, Minoru

    2005-04-01

    ZnO crystal growth by chemical vapor transport (CVT) is carried out using carbon as a transport agent. Under the optimum ΔT and growth temperature, a single crystal was grown. The carbon contamination is not detected by SIMS measurements and all the crystals are orange-red colored. It is claimed that the orange-red color is attributed to the shift of stoichiometry to zinc rich atmosphere.

  14. Chemical vapor deposition coating of fibers using microwave application

    NASA Technical Reports Server (NTRS)

    Barmatz, Martin B. (Inventor); Hoover, Gordon (Inventor); Jackson, Henry W. (Inventor)

    2000-01-01

    Chemical vapor deposition coating is carried out in a cylindrical cavity. The fibers are heated by a microwave source that is uses a TM0N0 mode, where O is an integer, and produces a field that depends substantially only on radius. The fibers are observed to determine their heating, and their position can be adjusted. Once the fibers are uniformly heated, a CVD reagent is added to process the fibers.

  15. Combustion chemical vapor desposited coatings for thermal barrier coating systems

    SciTech Connect

    Hampikian, J.M.; Carter, W.B.

    1995-10-01

    The new deposition process, combustion chemical vapor deposition, shows a great deal of promise in the area of thermal barrier coating systems. This technique produces dense, adherent coatings, and does not require a reaction chamber. Coatings can therefore be applied in the open atmosphere. The process is potentially suitable for producing high quality CVD coatings for use as interlayers between the bond coat and thermal barrier coating, and/or as overlayers, on top of thermal barrier coatings.

  16. Research on chemical vapor deposition processes for advanced ceramic coatings

    NASA Technical Reports Server (NTRS)

    Rosner, Daniel E.

    1993-01-01

    Our interdisciplinary background and fundamentally-oriented studies of the laws governing multi-component chemical vapor deposition (VD), particle deposition (PD), and their interactions, put the Yale University HTCRE Laboratory in a unique position to significantly advance the 'state-of-the-art' of chemical vapor deposition (CVD) R&D. With NASA-Lewis RC financial support, we initiated a program in March of 1988 that has led to the advances described in this report (Section 2) in predicting chemical vapor transport in high temperature systems relevant to the fabrication of refractory ceramic coatings for turbine engine components. This Final Report covers our principal results and activities for the total NASA grant of $190,000. over the 4.67 year period: 1 March 1988-1 November 1992. Since our methods and the technical details are contained in the publications listed (9 Abstracts are given as Appendices) our emphasis here is on broad conclusions/implications and administrative data, including personnel, talks, interactions with industry, and some known applications of our work.

  17. Chemical vapor deposition modeling: An assessment of current status

    NASA Technical Reports Server (NTRS)

    Gokoglu, Suleyman A.

    1991-01-01

    The shortcomings of earlier approaches that assumed thermochemical equilibrium and used chemical vapor deposition (CVD) phase diagrams are pointed out. Significant advancements in predictive capabilities due to recent computational developments, especially those for deposition rates controlled by gas phase mass transport, are demonstrated. The importance of using the proper boundary conditions is stressed, and the availability and reliability of gas phase and surface chemical kinetic information are emphasized as the most limiting factors. Future directions for CVD are proposed on the basis of current needs for efficient and effective progress in CVD process design and optimization.

  18. Fabrication of commercial-scale fiber-reinforced hot-gas filters by chemical vapor deposition

    SciTech Connect

    White, L.R.

    1992-11-01

    Goal was to fabricate a filter for removing particulates from hot gases; principal applications would be in advanced utility processes such as pressurized fluidized bed combustion or coal gasification combined cycle systems. Filters were made in two steps: make a ceramic fiber preform and coat it with SiC by chemical vapor infiltration (CVD). The most promising construction was felt/filament wound. Light, tough ceramic composite filters can be made; reinforcement by continuous fibers is needed to avoid brittleness. Direct metal to filter contact does not damage the top which simplifies installation. However, much of the filter surface of felt/filament wound structures is closed over by the CVD coating, and the surface is rough and subject to delamination. Recommendations are given for improving the filters.

  19. Chemical vapor deposition of conformal, functional, and responsive polymer films.

    PubMed

    Alf, Mahriah E; Asatekin, Ayse; Barr, Miles C; Baxamusa, Salmaan H; Chelawat, Hitesh; Ozaydin-Ince, Gozde; Petruczok, Christy D; Sreenivasan, Ramaswamy; Tenhaeff, Wyatt E; Trujillo, Nathan J; Vaddiraju, Sreeram; Xu, Jingjing; Gleason, Karen K

    2010-05-11

    Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers exhibiting strong retention of organic functional groups, and, in some cases, are responsive to external stimuli. Traditional wet-chemical chain- and step-growth mechanisms guide the development of new heterogeneous CVD polymerization techniques. Commonality with inorganic CVD methods facilitates the fabrication of hybrid devices. CVD polymers bridge microfabrication technology with chemical, biological, and nanoparticle systems and assembly. Robust interfaces can be achieved through covalent grafting enabling high-resolution (60 nm) patterning, even on flexible substrates. Utilizing only low-energy input to drive selective chemistry, modest vacuum, and room-temperature substrates, CVD polymerization is compatible with thermally sensitive substrates, such as paper, textiles, and plastics. CVD methods are particularly valuable for insoluble and infusible films, including fluoropolymers, electrically conductive polymers, and controllably crosslinked networks and for the potential to reduce environmental, health, and safety impacts associated with solvents. Quantitative models aid the development of large-area and roll-to-roll CVD polymer reactors. Relevant background, fundamental principles, and selected applications are reviewed. PMID:20544886

  20. Model for the Vaporization of Mixed Organometallic Compounds in the Metalorganic Chemical Vapor Deposition of High Temperature Superconducting Films

    NASA Technical Reports Server (NTRS)

    Meng, Guangyao; Zhou, Gang; Schneider, Roger L.; Sarma, Bimal K.; Levy, Moises

    1993-01-01

    A model of the vaporization and mass transport of mixed organometallics from a single source for thin film metalorganic chemical vapor deposition is presented. A stoichiometric gas phase can be obtained from a mixture of the organometallics in the desired mole ratios, in spite of differences in the volatilities of the individual compounds. Proper film composition and growth rates are obtained by controlling the velocity of a carriage containing the organometallics through the heating zone of a vaporizer.

  1. Chemical vapor deposition modeling for high temperature materials

    NASA Technical Reports Server (NTRS)

    Gokoglu, Suleyman A.

    1992-01-01

    The formalism for the accurate modeling of chemical vapor deposition (CVD) processes has matured based on the well established principles of transport phenomena and chemical kinetics in the gas phase and on surfaces. The utility and limitations of such models are discussed in practical applications for high temperature structural materials. Attention is drawn to the complexities and uncertainties in chemical kinetics. Traditional approaches based on only equilibrium thermochemistry and/or transport phenomena are defended as useful tools, within their validity, for engineering purposes. The role of modeling is discussed within the context of establishing the link between CVD process parameters and material microstructures/properties. It is argued that CVD modeling is an essential part of designing CVD equipment and controlling/optimizing CVD processes for the production and/or coating of high performance structural materials.

  2. Chemical vapor deposition of graphene on copper at reduced temperatures

    NASA Astrophysics Data System (ADS)

    Gallo, Eric M.; Willner, Bruce I.; Hwang, Jeonghyun; Sun, Shangzhu; Spencer, Michael; Salagaj, Tom; Mitchel, William C.; Sbrockey, Nick; Tompa, Gary S.

    2012-09-01

    A preliminary study on reduced temperature chemical vapor deposition of graphene on copper substrates was performed. Graphene's exceptional mechanical strength, very high electrical and thermal conductivity, and stability at atomic layer thicknesses, generates potential for a broad range of applications, from nanodevices to transparent conductor to chemical sensor. Of the techniques demonstrated for graphene formation, chemical vapor deposition is the sole process suitable for manufacturing large area films. While large area film deposition of graphene has been shown on metal substrates, this process has been limited to high temperatures, 900-1000C, which increases the cost of production and limits methods of integrating the graphene with other material structures. In this work, CVD of graphene on copper foil was attempted over a range of temperatures (650 - 950C) on substrates as large as 5 x 15 cm in a horizontal tube reactor. Depositions were performed using both CVD and upstream Plasma-Enhanced CVD (PECVD), and the results are compared for both techniques. Quality of graphene films deposited with and without plasma enhancement was characterized by micro Raman spectroscopy.

  3. Combustion chemical vapor deposited coatings for thermal barrier coating systems

    SciTech Connect

    Hampikian, J.M.; Carter, W.B.

    1995-12-31

    The new deposition process, combustion chemical vapor deposition, shows a great deal of promise in the area of thermal barrier coating systems. This technique produces dense, adherent coatings, and does not require a reaction chamber. Coatings can therefore be applied in the open atmosphere. The process is potentially suitable for producing high quality CVD coatings for use as interlayers between the bond coat and thermal barrier coating, and/or as overlayers, on top of thermal barrier coatings. In this report, the evaluation of alumina and ceria coatings on a nickel-chromium alloy is described.

  4. Fundamental studies of chemical vapor deposition diamond growth processes

    SciTech Connect

    Shaw, R.W.; Whitten, W.B.; Ramsey, J.M.; Heatherly, L.

    1991-01-01

    We are developing laser spectroscopic techniques to foster a fundamental understanding of diamond film growth by hot filament chemical vapor deposition (CVD). Several spectroscopic techniques are under investigation to identify intermediate species present in the bulk reactor volume, the thin active volume immediately above the growing film, and the actual growing surface. Such a comprehensive examination of the overall deposition process is necessary because a combination of gas phase and surface chemistry is probably operating. Resonantly enhanced multiphoton ionization (REMPI) techniques have been emphasized. A growth rector that permits through-the-substrate gas sampling for REMPI/time-of-flight mass spectroscopy has been developed. 7 refs., 2 figs.

  5. Unusual thermopower of inhomogeneous graphene grown by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Nam, Youngwoo; Sun, Jie; Lindvall, Niclas; Jae Yang, Seung; Rae Park, Chong; Woo Park, Yung; Yurgens, August

    2014-01-01

    We report on thermopower (TEP) and resistance measurements of inhomogeneous graphene grown by chemical vapor deposition (CVD). Unlike the conventional resistance of pristine graphene, the gate-dependent TEP shows a large electron-hole asymmetry. This can be accounted for by inhomogeneity of the CVD-graphene where individual graphene regions contribute with different TEPs. At the high magnetic field and low temperature, the TEP has large fluctuations near the Dirac point associated with the disorder in the CVD-graphene. TEP measurements reveal additional characteristics of CVD-graphene, which are difficult to obtain from the measurement of resistance alone.

  6. Chemical Vapor Deposited Zinc Sulfide. SPIE Press Monograph

    SciTech Connect

    McCloy, John S.; Tustison, Randal W.

    2013-04-22

    Zinc sulfide has shown unequaled utility for infrared windows that require a combination of long-wavelength infrared transparency, mechanical durability, and elevated-temperature performance. This book reviews the physical properties of chemical vapor deposited ZnS and their relationship to the CVD process that produced them. An in-depth look at the material microstructure is included, along with a discussion of the material's optical properties. Finally, because the CVD process itself is central to the development of this material, a brief history is presented.

  7. Chemical vapor deposited silicon carbide mirrors for extreme ultraviolet applications

    NASA Astrophysics Data System (ADS)

    Keski-Kuha, Ritva A.; Osantowski, John F.; Leviton, Douglas B.; Saha, Timo T.; Wright, Geraldine A.; Boucarut, Rene A.; Fleetwood, Charles M.; Madison, Timothy J.

    1997-01-01

    Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency in the extreme ultraviolet (EUV). For example, the development of the chemical vapor deposition (CVD) SiC mirrors provides an opportunity to extend the range of normal-incidence instruments dow to 60 nm. CVD SiC is a highly polishable material yielding low- scattering surfaces. High UV reflectivity and desirable mechanical and thermal properties make CVD SiC an attractive mirror and/or coating material for EUV applications. The EUV performance of SiC mirrors, as well as some strengths and problem areas, is discussed.

  8. Unusual thermopower of inhomogeneous graphene grown by chemical vapor deposition

    SciTech Connect

    Nam, Youngwoo; Sun, Jie; Lindvall, Niclas; Yurgens, August; Jae Yang, Seung; Rae Park, Chong; Woo Park, Yung

    2014-01-13

    We report on thermopower (TEP) and resistance measurements of inhomogeneous graphene grown by chemical vapor deposition (CVD). Unlike the conventional resistance of pristine graphene, the gate-dependent TEP shows a large electron-hole asymmetry. This can be accounted for by inhomogeneity of the CVD-graphene where individual graphene regions contribute with different TEPs. At the high magnetic field and low temperature, the TEP has large fluctuations near the Dirac point associated with the disorder in the CVD-graphene. TEP measurements reveal additional characteristics of CVD-graphene, which are difficult to obtain from the measurement of resistance alone.

  9. Chemical vapor deposition of amorphous semiconductor films. Final subcontract report

    SciTech Connect

    Rocheleau, R.E.

    1984-12-01

    Chemical vapor deposition (CVD) from higher order silanes has been studied for fabricating amorphous hydrogenated silicon thin-film solar cells. Intrinsic and doped a-Si:H films were deposited in a reduced-pressure, tubular-flow reactor, using disilane feed-gas. Conditions for depositing intrinsic films at growth rates up to 10 A/s were identified. Electrical and optical properties, including dark conductivity, photoconductivity, activation energy, optical absorption, band-gap and sub-band-gap absorption properties of CVD intrinsic material were characterized. Parameter space for depositing intrinsic and doped films, suitable for device analysis, was identified.

  10. Damping mechanisms in chemically vapor deposited SiC fibers

    NASA Technical Reports Server (NTRS)

    Dicarlo, James A.; Goldsby, Jon C.

    1993-01-01

    Evaluating the damping of reinforcement fibers is important for understanding their microstructures and the vibrational response of their structural composites. In this study the damping capacities of two types of chemically vapor deposited silicon carbide fibers were measured from -200 C to as high as 800 C. Measurements were made at frequencies in the range 50 to 15000 Hz on single cantilevered fibers. At least four sources were identified which contribute to fiber damping, the most significant being thermoelastic damping and grain boundary sliding. The mechanisms controlling all sources and their potential influence on fiber and composite performance are discussed.

  11. Plasma-enhanced chemical vapor deposition of multiwalled carbon nanofibers

    NASA Technical Reports Server (NTRS)

    Matthews, Kristopher; Cruden, Brett A.; Chen, Bin; Meyyappan, M.; Delzeit, Lance

    2002-01-01

    Plasma-enhanced chemical vapor deposition is used to grow vertically aligned multiwalled carbon nanofibers (MWNFs). The graphite basal planes in these nanofibers are not parallel as in nanotubes; instead they exhibit a small angle resembling a stacked cone arrangement. A parametric study with varying process parameters such as growth temperature, feedstock composition, and substrate power has been conducted, and these parameters are found to influence the growth rate, diameter, and morphology. The well-aligned MWNFs are suitable for fabricating electrode systems in sensor and device development.

  12. Spectroscopic Observation of Chemical Interaction Between Impact-induced Vapor Clouds and the Ambient Atmosphere

    NASA Technical Reports Server (NTRS)

    Sugita, S.; Heineck, J. T.; Schultz, P. H.

    2000-01-01

    Chemical reactions within impact-induced vapor clouds were observed in laboratory experiments using a spectroscopic method. The results indicate that projectile-derived carbon-rich vapor reacts intensively with atmospheric nitrogen.

  13. Chemical vapor deposited diamond-on-diamond powder composites (LDRD final report)

    SciTech Connect

    Panitz, J.K.; Hsu, W.L.; Tallant, D.R.; McMaster, M.; Fox, C.; Staley, D.

    1995-12-01

    Densifying non-mined diamond powder precursors with diamond produced by chemical vapor infiltration (CVI) is an attractive approach for forming thick diamond deposits that avoids many potential manufacturability problems associated with predominantly chemical vapor deposition (CVD) processes. The authors developed techniques for forming diamond powder precursors and densified these precursors in a hot filament-assisted reactor and a microwave plasma-assisted reactor. Densification conditions were varied following a fractional factorial statistical design. A number of conclusions can be drawn as a result of this study. High density diamond powder green bodies that contain a mixture of particle sizes solidify more readily than more porous diamond powder green bodies with narrow distributions of particle sizes. No composite was completely densified although all of the deposits were densified to some degree. The hot filament-assisted reactor deposited more material below the exterior surface, in the interior of the powder deposits; in contrast, the microwave-assisted reactor tended to deposit a CVD diamond skin over the top of the powder precursors which inhibited vapor phase diamond growth in the interior of the powder deposits. There were subtle variations in diamond quality as a function of the CVI process parameters. Diamond and glassy carbon tended to form at the exterior surface of the composites directly exposed to either the hot filament or the microwave plasma. However, in the interior, e.g. the powder/substrate interface, diamond plus diamond-like-carbon formed. All of the diamond composites produced were grey and relatively opaque because they contained flawed diamond, diamond-like-carbon and glassy carbon. A large amount of flawed and non-diamond material could be removed by post-CVI oxygen heat treatments. Heat treatments in oxygen changed the color of the composites to white.

  14. Condensable chemical vapors for sterilization of freeze dryers.

    PubMed

    Bardat, A; Schmitthaeusler, R; Renzi, E

    1996-01-01

    Sterilization of freeze dryers is usually performed by subjecting them to saturated steam under pressure by steam (121 degrees C, 2 bar a., 30 minutes). In order to avoid such stressful conditions, another process was designed on the basis of a strong oxidizing mixture of condensable chemical vapors, consisting of ozone and hydrogen peroxide in acidic conditions. This process works at sub-zero temperatures up to 30 degrees C and under negative pressure. 10(6), inoculum of standard biological indicators as well as wild types of bioburden were easely sterilized from 2 minutes up to 10 minutes. Other parameters were studied, in order to optimize the main process conditions: temperature, pressure, concentration of chemicals, type of micro-organisms and their environmental surroundings. PMID:8935775

  15. Chemical vapor deposition of hydrogenated amorphous silicon from disilane

    SciTech Connect

    Bogaert, R.J.; Russell, T.W.F.; Klein, M.T. . Dept. of Chemical Engineering); Rocheleau, R.E.; Baron, B.N. . Inst. of Energy Conversion)

    1989-10-01

    The authors describe hydrogenated amorphous silicon (a-Si:H) thin films deposited at growth rates of 1 to 30 A/s by chemical vapor deposition (CVD) from disilane source gas at 24 torr total pressure in a tubular reactor. The effects of substrate temperature and gas holding time (flow rate) on film growth rate and effluent gas composition were measured at temperatures ranging from 360{sup 0} to 485{sup 0}C and gas holding times from 3 to 62s. Effluent gases determined by gas chromatography included silane, disilane and other higher order silanes. A chemical reaction engineering model, based on a silylene (SiH/sub 2/) insertion gas phase reaction network and film growth from both SiH/sub 2/ and high molecular weight silicon species, Si/sub n/H/sub 2n/, was developed. The model predictions were in good agreement with experimentally determined growth rates and effluent gas compositions.

  16. Chemical vapor deposition (CVD) of cubic silicon carbide. Patent Application

    SciTech Connect

    Addamiano, A.

    1985-07-02

    This invention relates to the growth of cubic silicon carbide crystals. More specifically, this invention relates to the growth of cubic silicon carbide by Chemical Vapor Deposition (CVD). One object of the present invention is to provide a novel method for the production of cubic SiC for high temperature electronic devices. Another object of the present invention is to provide a novel method for the production of highly pure, single crystal cubic SiC that is duplicable. Another object of the present invention is to provide a novel method for the production of large-area single-crystal wafers of cubic SiC. These and other objects of the present invention can be achieved by a method for chemical vapor deposition (CVD) of cubic Silicon Carbide (SiC) comprising the steps of etching silicon substrated having one mechanically polished face; depositing a thin buffer layer of cubic SiC formed by reaction between a heated Si substrate and a H2-C3H8 gas mixuture; and depositing SiC on the buffer layer at high temperature using H2+C3HY+SiH4 mixture.

  17. Chemical vapor composite silicon carbide for space telescopes

    NASA Astrophysics Data System (ADS)

    Tanaka, C. T.; Webb, K.

    2006-06-01

    Components for space telescopes using high quality silicon carbide (SiC) produced via the chemical vapor composite (CVC) process are currently under development. This CVC process is a modification of chemical vapor deposition (CVD) and results in a dramatic reduction in residual stress of the SiC deposit. The resultant CVC SiC material has high modulus, high thermal conductivity and can be polished to better than 1nm RMS surface roughness, making it ideal for space telescopes requiring lightweight, stiff and thermally stable components. Moreover, due to its lower intrinsic stress, CVC SiC is much more readily scaled to large sizes and manufactured into the complex geometries needed for the telescope assemblies. Results are presented on the optical figure for a lightweight 15cm CVC SiC mirror demonstrating low wavefront error (<30nm peak-to-valley and <5.1nm rms). Theoretical and experimental modal analysis measured the first four resonant modes of the mirror and found a first modal frequency in the vicinity of 2100 Hz, representing a highly stiff mirror.

  18. Modeling of InP metalorganic chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Black, Linda R.; Clark, Ivan O.; Kui, J.; Jesser, William A.

    1991-01-01

    The growth of InP by metalorganic chemical vapor deposition (MOCVD) in a horizontal reactor is being modeled with a commercially available computational fluid dynamics modeling code. The mathematical treatment of the MOCVD process has four primary areas of concern: 1) transport phenomena, 2) chemistry, 3) boundary conditions, and 4) numerical solution methods. The transport processes involved in CVD are described by conservation of total mass, momentum, energy, and atomic species. Momentum conservation is described by a generalized form of the Navier-Stokes equation for a Newtonian fluid and laminar flow. The effect of Soret diffusion on the transport of particular chemical species and on the predicted deposition rate is examined. Both gas-phase and surface chemical reactions are employed in the model. Boundary conditions are specified at the inlet and walls of the reactor for temperature, fluid flow and chemical species. The coupled set of equations described above is solved by a finite difference method over a nonuniform rectilinear grid in both two and three dimensions. The results of the 2-D computational model is presented for gravity levels of zero- and one-g. The predicted growth rates at one-g are compared to measured growth rates on fused silica substrates.

  19. Minefield edge detection using a novel chemical vapor sensing technique

    NASA Astrophysics Data System (ADS)

    Fisher, Mark E.; Sikes, John

    2003-09-01

    Nomadics has developed a novel sensing technology that detects the chemical signature of explosives emanating from buried landmines. Canines have demonstrated the ability to detect these signatures, but use of canines for this task presents a number of logistical and physical limitations that can be overcome by use of chemical sensors. Nomadics is the exclusive licensee of novel amplifying fluorescent polymer materials developed by the Massachusetts Institute of Technology (MIT). These materials enable detection of ultra-trace concentrations of nitroaromatic compounds such as TNT, the most commonly utilized explosive in the production of landmines. When vapors of nitroaromatics are presented to the sensor, the fluorescent polymers emit light at a greatly reduced intensity, a property that enables rapid detection of trace quantities of explosives using relatively low-cost electronics and optics. Studies performed by Jenkins et al suggest that the chemical signature of a landmine is heterogeneous and can be dispersed a significant distance from the location of the mine. Because the signature is not highly localized and is not characterized by a well-defined concentration gradient, the sensor may have difficulty indicating the exact position of a mine, especially in high-density minefields. Conversely, if the chemical signature extends some distance from the mine position, the sensor may have utility in detecting the edges of minefields. In combat scenarios, this will allow commanders to select safe paths for personnel and vehicles. This paper will present the latest findings related to minefield edge detection at several test sites.

  20. Modeling and Simulation of Plasma Enhanced Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Smith, Aaron; Bett, Dominic; Cunningham, Monisha; Sen, Sudip

    2015-04-01

    Plasma Enhanced Chemical Vapor Deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Recent study from the X-ray diffraction spectra of SnO2 films deposited as a function of RF power apparently indicates that RF power is playing a stabilizing role and hence in the better deposition. The results show that the RF power results in smoother morphology, improved crystallinity, and lower sheet resistance value in the PECVD process. The PECVD processing allows deposition at lower temperatures, which is often critical in the manufacture of semiconductors. In this talk we will address two aspects of the problem, first to develop a model to study the mechanism of how the PECVD is effected by the RF power, and second to actually simulate the effect of RF power on PECVD. As the PECVD is a very important component of the plasma processing technology with many applications in the semiconductor technology and surface science, the research proposed here has the prospect to revolutionize the plasma processing technology through the stabilizing role of the RF power.

  1. Nanograined WC-Co Composite Powders by Chemical Vapor Synthesis

    NASA Astrophysics Data System (ADS)

    Ryu, Taegong; Sohn, H. Y.; Han, Gilsoo; Kim, Young-Ugk; Hwang, Kyu Sup; Mena, M.; Fang, Zhigang Z.

    2008-02-01

    Nanograined tungsten carbide (WC) Co composite powders were prepared by a chemical vapor synthesis (CVS) process that has previously been used for preparing the aluminides of titanium and nickel and other metallic and intermetallic powders at the University of Utah. To determine the optimum condition for producing nanograined WC-Co composite powders, the effects of carburization temperature, CH4 to WCl6 ratio, CH4 to H2 ratio, CoCl2 contents, and residence time of WC on the powder composition and particle size were investigated. The reduction and carburization of the vaporized chlorides by CH4-H2 mixtures produced nanograined WC and Co composite powder, which sometimes contained small levels of W2C, W, or the η (Co3W3C) phase. The presence of these incompletely carburized phases can be tolerated because they can be fully carburized during the subsequent sintering process. These phases can also be fully carburized by a separate post-treatment. The products were characterized by using X-ray diffraction (XRD) and a transmission electron microscope (TEM). As a result, nanograined WC-Co composite with the particle size less than 30 nm was obtained.

  2. Chemical vapor deposition coatings for oxidation protection of titanium alloys

    NASA Technical Reports Server (NTRS)

    Cunnington, G. R.; Robinson, J. C.; Clark, R. K.

    1991-01-01

    Results of an experimental investigation of the oxidation protection afforded to Ti-14Al-21Nb and Ti-14Al-23Nb-2V titanium aluminides and Ti-17Mo-3Al-3Nb titanium alloy by aluminum-boron-silicon and boron-silicon coatings are presented. These coatings are applied by a combination of physical vapor deposition (PVD) and chemical vapor deposition (CVD) processes. The former is for the application of aluminum, and the latter is for codeposition of boron and silicon. Coating thickness is in the range of 2 to 7 microns, and coating weights are 0.6 to 2.0 mg/sq cm. Oxidation testing was performed in air at temperatures to 1255 K in both static and hypersonic flow environments. The degree of oxidation protection provided by the coatings is determined from weight change measurements made during the testing and post test compositional analyses. Temperature-dependent total normal emittance data are also presented for four coating/substrate combinations. Both types of coatings provided excellent oxidation protection for the exposure conditions of this investigation. Total normal emittances were greater than 0.80 in all cases.

  3. Chemical Vapor Deposition at High Pressure in a Microgravity Environment

    NASA Technical Reports Server (NTRS)

    McCall, Sonya; Bachmann, Klaus; LeSure, Stacie; Sukidi, Nkadi; Wang, Fuchao

    1999-01-01

    In this paper we present an evaluation of critical requirements of organometallic chemical vapor deposition (OMCVD) at elevated pressure for a channel flow reactor in a microgravity environment. The objective of using high pressure is to maintain single-phase surface composition for materials that have high thermal decomposition pressure at their optimum growth temperature. Access to microgravity is needed to maintain conditions of laminar flow, which is essential for process analysis. Based on ground based observations we present an optimized reactor design for OMCVD at high pressure and reduced gravity. Also, we discuss non-intrusive real-time optical monitoring of flow dynamics coupled to homogeneous gas phase reactions, transport and surface processes. While suborbital flights may suffice for studies of initial stages of heteroepitaxy experiments in space are essential for a complete evaluation of steady-state growth.

  4. Optics applications of chemical vapor deposited beta-SiC

    NASA Astrophysics Data System (ADS)

    Goela, Jitendra S.; Pickering, Michael A.

    1997-09-01

    The fabrication process, properties and optics applications of transparent and opaque chemical vapor deposited (CVD) (beta) -SiC are reviewed. CVD-SiC is produced by the pyrolysis of methyltrichlorosilane, in excess H2, in a low-pressure CVD reactor. The CVD process has been successfully scaled to produce monolithic SiC parts of diameter up to 1.5-m and thickness 2.5-cm. The characterization of CVD-SiC for important physical, optical, mechanical and thermal properties indicates that it is a superior material for optics applications. Important properties of CVD-SiC are compared with those of the other candidate mirror and window materials. The applications of CVD-SiC for lightweight optics, x-ray telescopes, optical buffers, lens molds, optical standards and windows and domes are discussed in detail.

  5. Chemical vapor deposited {beta}-SiC for optics applications

    SciTech Connect

    Goela, J.S.; Pikcering, M.A.; Taylor, R.L.

    1995-08-01

    The fabrication, properties and optics applications of transparent and opaque Chemical Vapor Deposited (CVD) {beta}-SiC are reviewed. CVD-SiC is fabricated by the pyrolysis of methyltrichlorosilane, in excess H{sub 2}, in a low-pressure CVD reactor. The CVD process has been successfully scaled to produce monolithic SiC parts of diameter up to 1.5 m and thickness 2.5 cm. The characterization of CVD-SiC for important physical, optical, mechanical and thermal properties indicate that it is a superior material for optics applications. CVD-SiC properties are compared with those of the other candidate mirror and window materials. SiC process/property relationships are discussed, emphasizing the differences in process conditions, microstructure, and properties between transparent and opaque CVD-SiC.

  6. Synthesis of mullite coatings by chemical vapor deposition

    SciTech Connect

    Mulpuri, R.P.; Auger, M.; Sarin, V.K.

    1996-08-01

    Formation of mullite on ceramic substrates via chemical vapor deposition was investigated. Mullite is a solid solution of Al{sub 2}O{sub 3} and SiO{sub 2} with a composition of 3Al{sub 2}O{sub 3}{circ}2SiO{sub 2}. Thermodynamic calculations performed on the AlCl{sub 3}-SiCl{sub 4}-CO{sub 2}-H{sub 2} system were used to construct equilibrium CVD phase diagrams. With the aid of these diagrams and consideration of kinetic rate limiting factors, initial process parameters were determined. Through process optimization, crystalline CVD mullite coatings have been successfully grown on SiC and Si{sub 3}N{sub 4} substrates. Results from the thermodynamic analysis, process optimization, and effect of various process parameters on deposition rate and coating morphology are discussed.

  7. Strain relaxation in graphene grown by chemical vapor deposition

    SciTech Connect

    Troppenz, Gerald V. Gluba, Marc A.; Kraft, Marco; Rappich, Jörg; Nickel, Norbert H.

    2013-12-07

    The growth of single layer graphene by chemical vapor deposition on polycrystalline Cu substrates induces large internal biaxial compressive strain due to thermal expansion mismatch. Raman backscattering spectroscopy and atomic force microscopy were used to study the strain relaxation during and after the transfer process from Cu foil to SiO{sub 2}. Interestingly, the growth of graphene results in a pronounced ripple structure on the Cu substrate that is indicative of strain relaxation of about 0.76% during the cooling from the growth temperature. Removing graphene from the Cu substrates and transferring it to SiO{sub 2} results in a shift of the 2D phonon line by 27 cm{sup −1} to lower frequencies. This translates into additional strain relaxation. The influence of the processing steps, used etching solution and solvents on strain, is investigated.

  8. Development and study of chemical vapor deposited tantalum base alloys

    NASA Technical Reports Server (NTRS)

    Meier, G. H.; Bryant, W. A.

    1976-01-01

    A technique for the chemical vapor deposition of alloys was developed. The process, termed pulsing, involves the periodic injection of reactant gases into a previously-evacuated reaction chamber where they blanket the substrate almost instantaneously. Formation of alternating layers of the alloy components and subsequent homogenization allows the formation of an alloy of uniform composition with the composition being determined by the duration and relative numbers of the various cycles. The technique has been utilized to produce dense alloys of uniform thickness and composition (Ta- 10 wt % W) by depositing alternating layers of Ta and W by the hydrogen reduction of TaCl5 and WCl6. A similar attempt to deposit a Ta - 8 wt % W - 2 wt% Hf alloy was unsuccessful because of the difficulty in reducing HfCl4 at temperatures below those at which gas phase nucleation of Ta and W occurred.

  9. Creep of chemically vapor deposited SiC fibers

    NASA Technical Reports Server (NTRS)

    Dicarlo, J. A.

    1984-01-01

    The creep, thermal expansion, and elastic modulus properties for chemically vapor deposited SiC fibers were measured between 1000 and 1500 C. Creep strain was observed to increase logarithmically with time, monotonically with temperature, and linearly with tensile stress up to 600 MPa. The controlling activation energy was 480 + or - 20 kJ/mole. Thermal pretreatments near 1200 and 1450 C were found to significantly reduce fiber creep. These results coupled with creep recovery observations indicate that below 1400 C fiber creep is anelastic with neglible plastic component. This allowed a simple predictive method to be developed for describing fiber total deformation as a function of time, temperature, and stress. Mechanistic analysis of the property data suggests that fiber creep is the result of beta-SiC grain boundary sliding controlled by a small percent of free silicon in the grain boundaries.

  10. Quantitative Infrared Spectra of Vapor Phase Chemical Agents

    SciTech Connect

    Sharpe, Steven W.; Johnson, Timothy J.; Chu, P. M.; Kleimeyer, J.; Rowland, Brad

    2003-08-01

    Quantitative, moderately high resolution (0.1 cm-1) infrared spectra have been acquired for a number of nitrogen broadened (1 atm N2) vapor phase chemicals including: Sarin (GB), Soman (GD), Tabun (GA), Cyclosarin (GF), VX, Nitrogen Mustard (HN3), Sulfur Mustard (HD), and Lewisite (L). The spectra are acquired using a heated, flow-through White Cell1 of 5.6 meter optical path length. Each reported spectrum represents a statistical fit to Beer’s law, which allows for a rigorous calculation of uncertainty in the absorption coefficients. As part of an ongoing collaboration with the National Institute of Standards and Technology (NIST), cross-laboratory validation is a critical aspect of this work. In order to identify possible errors in the Dugway flow-through system, quantitative spectra of isopropyl alcohol from both NIST and Pacific Northwest National Laboratory (PNNL) are compared to similar data taken at Dugway proving Grounds (DPG).

  11. Radio-frequency plasma chemical vapor deposition growth of diamond

    NASA Technical Reports Server (NTRS)

    Meyer, Duane E.; Dillon, Rodney O.; Woollam, John A.

    1989-01-01

    Plasma chemical vapor deposition (CVD) at 13.56 MHz has been used to produce diamond particles in two different inductively coupled systems with a mixture of methane and hydrogen. The effect of a diamondlike carbon (DLC) overcoating on silicon, niobium, and stainless-steel substrates has been investigated and in the case of silicon has been found to enhance particle formation as compared to uncoated polished silicon. In addition the use of carbon monoxide in hydrogen has been found to produce well-defined individual faceted particles as well as polycrystalline films on quartz and DLC coated silicon substrates. Plasma CVD is a competitive approach to production of diamond films. It has the advantage over microwave systems of being easily scaled to large volume and high power.

  12. Chemical vapor synthesis and characterization of aluminum nanopowder

    NASA Astrophysics Data System (ADS)

    Choi, Jin Won; Sohn, Hong Yong; Choi, Young Joon; Fang, Zhigang Zak

    Aluminum is a component in many promising hydrogen storage materials such as aluminum hydride and complex aluminum hydrides. In this research, Al and TiAl 3-containing Al nanopowders were prepared by a chemical vapor synthesis (CVS) process using Mg as the reducing agent. XRD and EDS results indicated that the produced powder was composed of Al or Al with TiAl 3. The shape of the powder was spherical with the average size in the range of 10-50 nm measured by SEM, TEM, BET and ZetaPALS compared with the typically larger than 100 nm for commercially available fine Al powders. In addition, the effects of the operating conditions such as Ar flow rate, precursor feed rate and reaction temperature on the properties of the product powder were investigated.

  13. Chemical vapor deposition growth of patterned graphene on copper

    NASA Astrophysics Data System (ADS)

    Gutierrez, Humberto; Wang, Bei; Zhu, J.

    2010-03-01

    Graphene possesses unique electronic properties and application potentials. However, the synthesis of high-quality, single-layer graphene on large scale remains challenging. Mechanical exfoliation from graphite crystals yields graphene of the highest quality but in an uncontrolled and non-scalable way. Epitaxial growth on SiC has made significant advances in large-scale synthesis, although the cost is relatively high. Very recently, chemical vapor deposition (CVD) is used to grow graphene on Ni and Cu surfaces and has also produced large-area graphene of reasonably high quality. Cracks and ripples, however, present considerable challenges to the CVD growth and transfer process. We report the CVD growth of single-layer graphene on patterned, micron-size copper templates. Raman spectra of the films show low D-band and relatively narrow 2D peak, suggesting high quality. We present and discuss the transport properties of graphene films transferred onto an insulating substrate.

  14. Chemical vapor deposition fluid flow simulation modelling tool

    NASA Technical Reports Server (NTRS)

    Bullister, Edward T.

    1992-01-01

    Accurate numerical simulation of chemical vapor deposition (CVD) processes requires a general purpose computational fluid dynamics package combined with specialized capabilities for high temperature chemistry. In this report, we describe the implementation of these specialized capabilities in the spectral element code NEKTON. The thermal expansion of the gases involved is shown to be accurately approximated by the low Mach number perturbation expansion of the incompressible Navier-Stokes equations. The radiative heat transfer between multiple interacting radiating surfaces is shown to be tractable using the method of Gebhart. The disparate rates of reaction and diffusion in CVD processes are calculated via a point-implicit time integration scheme. We demonstrate the use above capabilities on prototypical CVD applications.

  15. Chemical vapor deposition of low reflective cobalt (II) oxide films

    NASA Astrophysics Data System (ADS)

    Amin-Chalhoub, Eliane; Duguet, Thomas; Samélor, Diane; Debieu, Olivier; Ungureanu, Elisabeta; Vahlas, Constantin

    2016-01-01

    Low reflective CoO coatings are processed by chemical vapor deposition from Co2(CO)8 at temperatures between 120 °C and 190 °C without additional oxygen source. The optical reflectivity in the visible and near infrared regions stems from 2 to 35% depending on deposition temperature. The combination of specific microstructural features of the coatings, namely a fractal "cauliflower" morphology and a grain size distribution more or less covering the near UV and IR wavelength ranges enhance light scattering and gives rise to a low reflectivity. In addition, the columnar morphology results in a density gradient in the vertical direction that we interpret as a refractive index gradient lowering reflectivity further down. The coating formed at 180 °C shows the lowest average reflectivity (2.9%), and presents an interesting deep black diffuse aspect.

  16. Synthesis of large-size graphene by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Wu, Ruizhe; Ding, Yao; Gan, Lin; Luo, Zhengtang

    2015-09-01

    The requirement for long-range structure coherence and property uniformity for graphene-based electronics are crucial for their applications in electronics. Here, we briefly review our recent progress on synthesis of large-size graphene by seeded growth method. We demonstrate a seeded growth method which allows us to reduce the nucleation density in early stage of Chemical Vapor Deposition (CVD) leading to the production of low density of graphene grains and consequently achieve grain size of sub-centimeter. We further demonstrate that we can amplify the graphene grain size by limiting the second seeded growth only from the graphene seed edges. Moreover, we demonstrate that similar method can be used for the preparation of large-grain bilayer graphene flakes.

  17. Chemical vapor deposition of boron-doped hydrogenated amorphous silicon

    SciTech Connect

    Ellis F.B. Jr.; Delahoy, A.E.

    1985-07-15

    Deposition conditions and film properties for a variety of boron-doped hydrogenated amorphous silicon films and silicon-carbon films produced by chemical vapor deposition (CVD) are discussed. Deposition gases include monosilane, disilane, trisilane, and acetylene. Two types of optically wide band-gap p layers are obtained. One of these window p layers (without carbon) has been extensively tested in photovoltaic devices. Remarkably, this p layer can be deposited between about 200 to 300 /sup 0/C. A typical open circuit voltage in an all CVD p-i-n device is 0.70--0.72 V, and in a hybrid device where the i and n layers are deposited by glow discharge, 0.8--0.83 V.

  18. Textures and morphologies of chemical vapor deposited (CVD) diamond

    SciTech Connect

    Clausing, R.E.; Heatherly, L.; Horton, L.L.; Specht, E.D.; Begun, G.M. ); Wang, Z.L. )

    1991-01-01

    The textures, surface morphologies, structural perfection, and properties of diamond films grown by activated chemical vapor deposition (CVD) vary greatly with the growth conditions. The evolution of two commonly observed polycrystalline morphologies, which give rise to <110> textures, will be described as well as the development of four films grown to produce <100>, <111>, and near <100>'' textures with various combinations of growth facets. These films were grown to test models of texture development. Films free of twins, microtwins, and stacking faults are deposited when only (100) facets are permitted to grow. In polycrystalline materials, special conditions must be met to avoid the formation of planar defects at the peripheries of individual crystallites. The planar defects grow from (111) or mixed microfaceted surfaces. Twinning plays an important role in growth of (111) faceted surfaces. The films have been characterized with Raman spectroscopy, x-ray diffraction, transmission electron microscopy (TEM), scanning electron microscopy (SEM), and optical methods. 13 refs., 7 figs.

  19. Characterization of Carbon Nanotubes Grown by Chemical Vapor Deposition

    NASA Technical Reports Server (NTRS)

    Cochrane, J. C.; Zhu, Shen; Su, Ching-Hua; Lehoczky, S. L.; Rose, M. Franklin (Technical Monitor)

    2001-01-01

    Since the superior properties of multi-wall carbon nanotubes (MWCNT) could improve numerous devices such as electronics and sensors, many efforts have been made in investigating the growth mechanism of MWCNT to synthesize high quality MWCNT. Chemical vapor deposition (CVD) is widely used for MWCNT synthesis, and scanning electron microscopy (SEM) and energy dispersive x-ray spectroscopy (EDS) are useful methods for analyzing the structure, morphology and composition of MWCNT. Temperature and pressure are two important growth parameters for fabricating carbon nanotubes. In MWCNT growth by CVD, the plasma assisted method is normally used for low temperature growth. However a high temperature environment is required for thermal CVD. A systematic study of temperature and pressure-dependence is very helpful to understanding MWCNT growth. Transition metal particles are commonly used as catalysis in carbon nanotube growth. It is also interesting to know how temperature and pressure affect the interface of carbon species and catalyst particles

  20. Low Temperature Chemical Vapor Deposition Of Thin Film Magnets

    DOEpatents

    Miller, Joel S.; Pokhodnya, Kostyantyn I.

    2003-12-09

    A thin-film magnet formed from a gas-phase reaction of tetracyanoetheylene (TCNE) OR (TCNQ), 7,7,8,8-tetracyano-P-quinodimethane, and a vanadium-containing compound such as vanadium hexcarbonyl (V(CO).sub.6) and bis(benzene)vanalium (V(C.sub.6 H.sub.6).sub.2) and a process of forming a magnetic thin film upon at least one substrate by chemical vapor deposition (CVD) at a process temperature not exceeding approximately 90.degree. C. and in the absence of a solvent. The magnetic thin film is particularly suitable for being disposed upon rigid or flexible substrates at temperatures in the range of 40.degree. C. and 70.degree. C. The present invention exhibits air-stable characteristics and qualities and is particularly suitable for providing being disposed upon a wide variety of substrates.

  1. Chemical and Magnetic Order in Vapor-Deposited Metal Films

    NASA Astrophysics Data System (ADS)

    Rooney, Peter Wiliam

    1995-01-01

    A stochastic Monte Carlo model of vapor deposition and growth of a crystalline, binary, A_3 B metallic alloy with a negative energy of mixing has been developed which incorporates deposition and surface diffusion in a physically correct manner and allows the simulation of deposition rates that are experimentally realizable. The effects of deposition rate and growth temperature on the development of short range order (SRO) in vapor-deposited films have been examined using this model. SRO in the simulated films increases with growth temperature up to the point at which the temperature corresponds to the energy of mixing, but we see no corresponding development of anisotropic SRO (preferential ordering of A-B pairs along the growth direction). Epitaxial (100) and (111) CoPt_3 films have been deposited over a range of growth temperatures from -50^circ C to 800^circC. Curie temperature (T_{rm c}) and saturation magnetization are dramatically enhanced in those films grown near 400^circ C over the values expected for the chemically homogeneous alloy. Magnetization data indicates that the high T _{rm c} films are inhomogeneous. These phenomena are interpreted as evidence of a previously unobserved magnetically driven miscibility gap in the Co-Pt phase diagram. Films grown near 400^circ C exhibit large uniaxial perpendicular magnetic anisotropy that cannot be accounted for by strain. The observed anisotropy coincides with the chemical phase separation and it seems likely that these two phenomena are related. Long range order (LRO) in the as-deposited films peaks at a growth temperature of 630^circC and then decreases with decreasing growth temperature. The decrease in LRO is either due to kinetic frustration or to competition from magnetically induced Co clustering. Theoretical phase diagrams based on the appropriate Blume-Emery-Griffiths Hamiltonian suggest the latter.

  2. Direct synthesis of large area graphene on insulating substrate by gallium vapor-assisted chemical vapor deposition

    SciTech Connect

    Murakami, Katsuhisa Hiyama, Takaki; Kuwajima, Tomoya; Fujita, Jun-ichi; Tanaka, Shunsuke; Hirukawa, Ayaka; Kano, Emi; Takeguchi, Masaki

    2015-03-02

    A single layer of graphene with dimensions of 20 mm × 20 mm was grown directly on an insulating substrate by chemical vapor deposition using Ga vapor catalysts. The graphene layer showed highly homogeneous crystal quality over a large area on the insulating substrate. The crystal quality of the graphene was measured by Raman spectroscopy and was found to improve with increasing Ga vapor density on the reaction area. High-resolution transmission electron microscopy observations showed that the synthesized graphene had a perfect atomic-scale crystal structure within its grains, which ranged in size from 50 nm to 200 nm.

  3. Graphene-Based Chemical Vapor Sensors for Electronic Nose Applications

    NASA Astrophysics Data System (ADS)

    Nallon, Eric C.

    An electronic nose (e-nose) is a biologically inspired device designed to mimic the operation of the olfactory system. The e-nose utilizes a chemical sensor array consisting of broadly responsive vapor sensors, whose combined response produces a unique pattern for a given compound or mixture. The sensor array is inspired by the biological function of the receptor neurons found in the human olfactory system, which are inherently cross-reactive and respond to many different compounds. The use of an e-nose is an attractive approach to predict unknown odors and is used in many fields for quantitative and qualitative analysis. If properly designed, an e-nose has the potential to adapt to new odors it was not originally designed for through laboratory training and algorithm updates. This would eliminate the lengthy and costly R&D costs associated with materiel and product development. Although e-nose technology has been around for over two decades, much research is still being undertaken in order to find new and more diverse types of sensors. Graphene is a single-layer, 2D material comprised of carbon atoms arranged in a hexagonal lattice, with extraordinary electrical, mechanical, thermal and optical properties due to its 2D, sp2-bonded structure. Graphene has much potential as a chemical sensing material due to its 2D structure, which provides a surface entirely exposed to its surrounding environment. In this configuration, every carbon atom in graphene is a surface atom, providing the greatest possible surface area per unit volume, so that electron transport is highly sensitive to adsorbed molecular species. Graphene has gained much attention since its discovery in 2004, but has not been realized in many commercial electronics. It has the potential to be a revolutionary material for use in chemical sensors due to its excellent conductivity, large surface area, low noise, and versatile surface for functionalization. In this work, graphene is incorporated into a

  4. Correlation of chemical evaporation rate with vapor pressure.

    PubMed

    Mackay, Donald; van Wesenbeeck, Ian

    2014-09-01

    A new one-parameter correlation is developed for the evaporation rate (ER) of chemicals as a function of molar mass (M) and vapor pressure (P) that is simpler than existing correlations. It applies only to liquid surfaces that are unaffected by the underlying solid substrate as occurs in the standard ASTM evaporation rate test and to quiescent liquid pools. The relationship has a sounder theoretical basis than previous correlations because ER is correctly correlated with PM rather than P alone. The inclusion of M increases the slope of previous log ER versus log P regressions to a value close to 1.0 and yields a simpler one-parameter correlation, namely, ER (μg m(-1) h(-1)) = 1464P (Pa) × M (g mol(-1)). Applications are discussed for the screening level assessment and ranking of chemicals for evaporation rate, such as pesticides, fumigants, and hydrocarbon carrier fluids used in pesticide formulations, liquid consumer products used indoors, and accidental spills of liquids. The mechanistic significance of the single parameter as a mass-transfer coefficient or velocity is discussed. PMID:25105222

  5. Conversion Coatings for Aluminum Alloys by Chemical Vapor Deposition Mechanisms

    NASA Technical Reports Server (NTRS)

    Reye, John T.; McFadden, Lisa S.; Gatica, Jorge E.; Morales, Wilfredo

    2004-01-01

    With the rise of environmental awareness and the renewed importance of environmentally friendly processes, the United States Environmental Protection Agency has targeted surface pre-treatment processes based on chromates. Indeed, this process has been subject to regulations under the Clean Water Act as well as other environmental initiatives, and there is today a marked movement to phase the process out in the near future. Therefore, there is a clear need for new advances in coating technology that could provide practical options for replacing present industrial practices. Depending on the final application, such coatings might be required to be resistant to corrosion, act as chemically resistant coatings, or both. This research examined a chemical vapor deposition (CVD) mechanism to deposit uniform conversion coatings onto aluminum alloy substrates. Robust protocols based on solutions of aryl phosphate ester and multi-oxide conversion coating (submicron) films were successfully grown onto the aluminum alloy samples. These films were characterized by X-ray Photoelectron Spectroscopy (XPS). Preliminary results indicate the potential of this technology to replace aqueous-based chromate processes.

  6. Nanostructure Engineered Chemical Sensors for Hazardous Gas and Vapor Detection

    NASA Technical Reports Server (NTRS)

    Li, Jing; Lu, Yijiang

    2005-01-01

    A nanosensor technology has been developed using nanostructures, such as single walled carbon nanotubes (SWNTs) and metal oxides nanowires or nanobelts, on a pair of interdigitated electrodes (IDE) processed with a silicon based microfabrication and micromachining technique. The IDE fingers were fabricated using thin film metallization techniques. Both in-situ growth of nanostructure materials and casting of the nanostructure dispersions were used to make chemical sensing devices. These sensors have been exposed to hazardous gases and vapors, such as acetone, benzene, chlorine, and ammonia in the concentration range of ppm to ppb at room temperature. The electronic molecular sensing in our sensor platform can be understood by electron modulation between the nanostructure engineered device and gas molecules. As a result of the electron modulation, the conductance of nanodevice will change. Due to the large surface area, low surface energy barrier and high thermal and mechanical stability, nanostructured chemical sensors potentially can offer higher sensitivity, lower power consumption and better robustness than the state-of-the-art systems, which make them more attractive for defense and space applications. Combined with MEMS technology, light weight and compact size sensors can be made in wafer scale with low cost.

  7. Chemical vapor deposition of amorphous silicon films from disilane

    SciTech Connect

    Bogaert, R.J.

    1986-01-01

    Amorphous silicon films for fabrication of solar cells have been deposited by thermal chemical vapor deposition (CVD) from disilane (Si/sub 2/H/sub 6/) using a tubular flow reactor. A mathematical description for the CVD reactor was developed and solved by a numerical procedure. The proposed chemical reaction network for the model is based on silylene (SiH/sub 2/) insertion in the gas phase and film growth from SiH/sub 2/ and silicon polymers (Si/sub n/N/sub 2n/, n approx. 10). Estimates of the rate constants have been obtained for trisilane decomposition, silicon polymer formation, and polymer dehydrogenation. The silane unimolecular decomposition rate constants were corrected for pressure effects. The model behavior is compared to the experimental results over the range of conditions: reactor temperature (360 to 485/sup 0/C), pressures (2 to 48 torr), and gas holding time (1 to 70 s). Within the above range of conditions, film growth rate varies from 0.01 to 30 A/s. Results indicate that silicon polymers are the main film precursors for gas holding times greater than 3 s. Film growth by silylene only becomes important at short holding times, large inert gas dilution, and positions near the beginning of the reactor hot zone.

  8. Advanced deposition model for thermal activated chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Cai, Dang

    Thermal Activated Chemical Vapor Deposition (TACVD) is defined as the formation of a stable solid product on a heated substrate surface from chemical reactions and/or dissociation of gaseous reactants in an activated environment. It has become an essential process for producing solid film, bulk material, coating, fibers, powders and monolithic components. Global market of CVD products has reached multi billions dollars for each year. In the recent years CVD process has been extensively used to manufacture semiconductors and other electronic components such as polysilicon, AlN and GaN. Extensive research effort has been directed to improve deposition quality and throughput. To obtain fast and high quality deposition, operational conditions such as temperature, pressure, fluid velocity and species concentration and geometry conditions such as source-substrate distance need to be well controlled in a CVD system. This thesis will focus on design of CVD processes through understanding the transport and reaction phenomena in the growth reactor. Since the in situ monitor is almost impossible for CVD reactor, many industrial resources have been expended to determine the optimum design by semi-empirical methods and trial-and-error procedures. This approach has allowed the achievement of improvements in the deposition sequence, but begins to show its limitations, as this method cannot always fulfill the more and more stringent specifications of the industry. To resolve this problem, numerical simulation is widely used in studying the growth techniques. The difficulty of numerical simulation of TACVD crystal growth process lies in the simulation of gas phase and surface reactions, especially the latter one, due to the fact that very limited kinetic information is available in the open literature. In this thesis, an advanced deposition model was developed to study the multi-component fluid flow, homogeneous gas phase reactions inside the reactor chamber, heterogeneous surface

  9. A model of silicon carbide chemical vapor deposition

    SciTech Connect

    Allendorf, M.D.; Kee, R.J. )

    1991-03-01

    This paper presents a model describing the interacting gas phase and surface chemistry present during the steady-state chemical vapor deposition (CVD) of silicon carbide (SiC). In this work, the authors treat the case of steady-state deposition of SiC from silane (SiH{sub 4}) and propane (C{sub 3}H{sub 8}) mixtures in hydrogen carrier gas at one atmosphere pressure. Epitaxial deposition is assumed to occur on a pre-existing epitaxial silicon carbide crystal. Pyrolysis of SiH{sub 4} and C{sub 3}H{sub 8} is modeled by 83 elementary gas-phase reactions. A set of 36 reactions of gas- phase species with the surface is used to simulate the deposition process. Rates for the gas/surface reactions were obtained from experimental measurements of sticking coefficients in the literature and theoretical estimates. The authors' results represent the first simulation of a silicon carbide deposition process that includes detailed description of both the gas phase and surface reactions. The chemical reaction mechanism is also combined with a model of a rotating disk reactor (RDR), which is a convenient way to study the interaction of chemical reactions with fluid mechanics. Transport of species from the gas to the surface is accounted for using multicomponent transport properties. Predictions of deposition rates as a function of susceptor temperature, disk rotation rate, and reactant partial pressure are presented. In addition, velocity, temperature, and concentration profiles normal to the heated disk for 41 gas-phase species are determined using reactor conditions typical of epitaxial silicon carbide deposition on silicon substrates.

  10. Graphene by one-step chemical vapor deposition from ferrocene vapors: Properties and electrochemical evaluation

    NASA Astrophysics Data System (ADS)

    Pilatos, George; Perdikaki, Anna V.; Sapalidis, Andreas; Pappas, George S.; Giannakopoulou, Tatiana; Tsoutsou, Dimitra; Xenogiannopoulou, Evangelia; Boukos, Nikos; Dimoulas, Athanasios; Trapalis, Christos; Kanellopoulos, Nick K.; Karanikolos, Georgios N.

    2016-02-01

    Growth of few-layer graphene using ferrocene as precursor by chemical vapor deposition is reported. The growth did not involve any additional carbon or catalyst source or external hydrocarbon gases. Parametric investigation was performed using different conditions, namely, varying growth temperature from 600 to1000 °C, and growth duration from 5 min to 3 h, as well as using fast quenching or gradual cooling after the thermal treatment, in order to examine the effect on the quality of the produced graphene. The growth took place on silicon wafers and resulted, under optimal conditions, in formation of graphene with 2-3 layers and high graphitic quality, as evidenced by Raman spectroscopy, with characteristic full width at half maximum of the 2D band of 49.46 cm-1, and I2D/IG and ID/IG intensity ratios of 1.15 and 0.26, respectively. Atomic force microscopy and X-ray photoelectron spectroscopy were employed to further evaluate graphene characteristics and enlighten growth mechanism. Electrochemical evaluation of the developed material was performed using cyclic voltammetry, electrochemical impedance spectroscopy, and galvanostatic charge-discharge measurements.

  11. Water-assisted chemical vapor deposition synthesis of boron nitride nanotubes and their photoluminescence property

    NASA Astrophysics Data System (ADS)

    Li, Juan; Li, Jianbao; Yin, Yanchun; Chen, Yongjun; Bi, Xiaofan

    2013-09-01

    A novel water-assisted chemical vapor deposition (CVD) method for the efficient synthesis of boron nitride (BN) nanotubes is demonstrated. The replacement of metal oxide by water vapor could continuously generate intermediate boron oxide vapor and enhance the production of BN nanotubes. The nanotubes synthesized when an appropriate amount of water vapor was introduced had an average diameter of about 80 nm and lengths of several hundred μm. The diameter and yield of nanotubes could be controlled by tuning the amount of water vapor. This simple water-assisted CVD approach paves a new path to the fabrication of BN nanotubes in large quantities.

  12. Growth of graphene underlayers by chemical vapor deposition

    SciTech Connect

    Fabiane, Mopeli; Khamlich, Saleh; Bello, Abdulhakeem; Dangbegnon, Julien; Momodu, Damilola; Manyala, Ncholu; Charlie Johnson, A. T.

    2013-11-15

    We present a simple and very convincing approach to visualizing that subsequent layers of graphene grow between the existing monolayer graphene and the copper catalyst in chemical vapor deposition (CVD). Graphene samples were grown by CVD and then transferred onto glass substrates by the bubbling method in two ways, either direct-transfer (DT) to yield poly (methyl methacrylate) (PMMA)/graphene/glass or (2) inverted transfer (IT) to yield graphene/PMMA/glass. Field emission scanning electron microscopy (FE-SEM) and atomic force microscopy (AFM) were used to reveal surface features for both the DT and IT samples. The results from FE-SEM and AFM topographic analyses of the surfaces revealed the underlayer growth of subsequent layers. The subsequent layers in the IT samples are visualized as 3D structures, where the smaller graphene layers lie above the larger layers stacked in a concentric manner. The results support the formation of the so-called “inverted wedding cake” stacking in multilayer graphene growth.

  13. Model of carrier dynamics in chemical vapor deposition diamond detectors

    SciTech Connect

    Borchi, Emilio; Lagomarsino, Stefano; Mersi, Stefano; Sciortino, Silvio

    2005-03-01

    We propose a quantitative model of electronic transport on the basis of a conductivity characterization of diamond-based sensors exposed to {beta} radiation. Some of the investigated samples have been irradiated with neutron up to a fluence of 2x10{sup 15}/cm{sup 2}. Radiation-induced current measurements have been performed to study the trapping and recombination of deep defect levels in the diamond band gap. We present a quantitative analysis of the passivation of deep traps and the release of carriers during thermal fading between consecutive exposures. We determine the density of trap states per unit volume and per unit energy and their capture cross sections. We also evaluate the modification of these parameters after neutron irradiation. Our analysis gives the cross sections of the traps involved in our measurements with an accuracy of 20-50%, which is far better than that attainable with thermal spectroscopy. Our results on the capture cross section of the recombination centers agree with relevant works presented in literature on natural IIa diamond. We propose that some defects are of the same nature in chemical vapor deposition diamond, but their concentration is far lower in the state-of-the-art material. We also study a modification of the trap level distribution after neutron irradiation. Finally we propose a rationale for the improvement obtained in recent years in the performances of top quality polycrystalline diamond sensors.

  14. Thirty Gigahertz Optoelectronic Mixing in Chemical Vapor Deposited Graphene.

    PubMed

    Montanaro, Alberto; Mzali, Sana; Mazellier, Jean-Paul; Bezencenet, Odile; Larat, Christian; Molin, Stephanie; Morvan, Loïc; Legagneux, Pierre; Dolfi, Daniel; Dlubak, Bruno; Seneor, Pierre; Martin, Marie-Blandine; Hofmann, Stephan; Robertson, John; Centeno, Alba; Zurutuza, Amaia

    2016-05-11

    The remarkable properties of graphene, such as broadband optical absorption, high carrier mobility, and short photogenerated carrier lifetime, are particularly attractive for high-frequency optoelectronic devices operating at 1.55 μm telecom wavelength. Moreover, the possibility to transfer graphene on a silicon substrate using a complementary metal-oxide-semiconductor-compatible process opens the ability to integrate electronics and optics on a single cost-effective chip. Here, we report an optoelectronic mixer based on chemical vapor-deposited graphene transferred on an oxidized silicon substrate. Our device consists in a coplanar waveguide that integrates a graphene channel, passivated with an atomic layer-deposited Al2O3 film. With this new structure, 30 GHz optoelectronic mixing in commercially available graphene is demonstrated for the first time. In particular, using a 30 GHz intensity-modulated optical signal and a 29.9 GHz electrical signal, we show frequency downconversion to 100 MHz. These results open promising perspectives in the domain of optoelectronics for radar and radio-communication systems. PMID:27043922

  15. Temperature admittance spectroscopy of boron doped chemical vapor deposition diamond

    NASA Astrophysics Data System (ADS)

    Zubkov, V. I.; Kucherova, O. V.; Bogdanov, S. A.; Zubkova, A. V.; Butler, J. E.; Ilyin, V. A.; Afanas'ev, A. V.; Vikharev, A. L.

    2015-10-01

    Precision admittance spectroscopy measurements over wide temperature and frequency ranges were carried out for chemical vapor deposition epitaxial diamond samples doped with various concentrations of boron. It was found that the experimentally detected boron activation energy in the samples decreased from 314 meV down to 101 meV with an increase of B/C ratio from 600 to 18000 ppm in the gas reactants. For the heavily doped samples, a transition from thermally activated valence band conduction to hopping within the impurity band (with apparent activation energy 20 meV) was detected at temperatures 120-150 K. Numerical simulation was used to estimate the impurity DOS broadening. Accurate determination of continuously altering activation energy, which takes place during the transformation of conduction mechanisms, was proposed by numerical differentiation of the Arrhenius plot. With increase of boron doping level the gradual decreasing of capture cross section from 3 × 10-13 down to 2 × 10-17 cm2 was noticed. Moreover, for the hopping conduction the capture cross section becomes 4 orders of magnitude less (˜2 × 10-20 cm2). At T > Troom in doped samples the birth of the second conductance peak was observed. We attribute it to a defect, related to the boron doping of the material.

  16. nanowires by solid-source chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Han, Ning; Wang, Fengyun; Yang, Zaixing; Yip, SenPo; Dong, Guofa; Lin, Hao; Fang, Ming; Hung, TakFu; Ho, Johnny C.

    2014-07-01

    Growing Ga2O3 dielectric materials at a moderately low temperature is important for the further development of high-mobility III-V semiconductor-based nanoelectronics. Here, β-Ga2O3 nanowires are successfully synthesized at a relatively low temperature of 610°C by solid-source chemical vapor deposition employing GaAs powders as the source material, which is in a distinct contrast to the typical synthesis temperature of above 1,000°C as reported by other methods. In this work, the prepared β-Ga2O3 nanowires are mainly composed of Ga and O elements with an atomic ratio of approximately 2:3. Importantly, they are highly crystalline in the monoclinic structure with varied growth orientations in low-index planes. The bandgap of the β-Ga2O3 nanowires is determined to be 251 nm (approximately 4.94 eV), in good accordance with the literature. Also, electrical characterization reveals that the individual nanowire has a resistivity of up to 8.5 × 107 Ω cm, when fabricated in the configuration of parallel arrays, further indicating the promise of growing these highly insulating Ga2O3 materials in this III-V nanowire-compatible growth condition.

  17. Chemical Vapor Deposition of an Organic Magnet, Vanadium Tetracyanoethylene.

    PubMed

    Harberts, Megan; Lu, Yu; Yu, Howard; Epstein, Arthur J; Johnston-Halperin, Ezekiel

    2015-01-01

    Recent progress in the field of organic materials has yielded devices such as organic light emitting diodes (OLEDs) which have advantages not found in traditional materials, including low cost and mechanical flexibility. In a similar vein, it would be advantageous to expand the use of organics into high frequency electronics and spin-based electronics. This work presents a synthetic process for the growth of thin films of the room temperature organic ferrimagnet, vanadium tetracyanoethylene (V[TCNE]x, x~2) by low temperature chemical vapor deposition (CVD). The thin film is grown at <60 °C, and can accommodate a wide variety of substrates including, but not limited to, silicon, glass, Teflon and flexible substrates. The conformal deposition is conducive to pre-patterned and three-dimensional structures as well. Additionally this technique can yield films with thicknesses ranging from 30 nm to several microns. Recent progress in optimization of film growth creates a film whose qualities, such as higher Curie temperature (600 K), improved magnetic homogeneity, and narrow ferromagnetic resonance line-width (1.5 G) show promise for a variety of applications in spintronics and microwave electronics. PMID:26168285

  18. Chemical vapor deposition of high T sub c superconductors

    NASA Technical Reports Server (NTRS)

    Webb, G. W.; Engelhardt, J. J.

    1978-01-01

    The results are reported of an investigation into the synthesis and properties of high temperature superconducting materials. A chemical vapor deposition apparatus was designed and built which is suitable for the preparation of multicomponent metal films This apparatus was used to prepare a series of high T sub c A-15 structure superconducting films in the binary system Nb-Ge. The effect on T sub c of a variety of substrate materials was investigated. An extensive series of ternary alloys were also prepared. Conditions allowing the brittle high T sub c (approximately 18 K) A-15 structure superconductor Nb3A1 to be prepared in a low T sub c but ductile form were found. Some of the ways that the ductile (bcc) form can be cold worked or machined are described. Measurements of rate of transformation of cold worked bcc material to the high T sub c A-15 structure with low temperature annealing are given. Preliminary measurements indicate that this material has attractive high field critical current densities.

  19. Residual metallic contamination of transferred chemical vapor deposited graphene.

    PubMed

    Lupina, Grzegorz; Kitzmann, Julia; Costina, Ioan; Lukosius, Mindaugas; Wenger, Christian; Wolff, Andre; Vaziri, Sam; Östling, Mikael; Pasternak, Iwona; Krajewska, Aleksandra; Strupinski, Wlodek; Kataria, Satender; Gahoi, Amit; Lemme, Max C; Ruhl, Guenther; Zoth, Guenther; Luxenhofer, Oliver; Mehr, Wolfgang

    2015-05-26

    Integration of graphene with Si microelectronics is very appealing by offering a potentially broad range of new functionalities. New materials to be integrated with the Si platform must conform to stringent purity standards. Here, we investigate graphene layers grown on copper foils by chemical vapor deposition and transferred to silicon wafers by wet etching and electrochemical delamination methods with respect to residual submonolayer metallic contaminations. Regardless of the transfer method and associated cleaning scheme, time-of-flight secondary ion mass spectrometry and total reflection X-ray fluorescence measurements indicate that the graphene sheets are contaminated with residual metals (copper, iron) with a concentration exceeding 10(13) atoms/cm(2). These metal impurities appear to be partially mobile upon thermal treatment, as shown by depth profiling and reduction of the minority charge carrier diffusion length in the silicon substrate. As residual metallic impurities can significantly alter electronic and electrochemical properties of graphene and can severely impede the process of integration with silicon microelectronics, these results reveal that further progress in synthesis, handling, and cleaning of graphene is required to advance electronic and optoelectronic applications. PMID:25853630

  20. Charged impurity-induced scatterings in chemical vapor deposited graphene

    NASA Astrophysics Data System (ADS)

    Li, Ming-Yang; Tang, Chiu-Chun; Ling, D. C.; Li, L. J.; Chi, C. C.; Chen, Jeng-Chung

    2013-12-01

    We investigate the effects of defect scatterings on the electric transport properties of chemical vapor deposited (CVD) graphene by measuring the carrier density dependence of the magneto-conductivity. To clarify the dominant scattering mechanism, we perform extensive measurements on large-area samples with different mobility to exclude the edge effect. We analyze our data with the major scattering mechanisms such as short-range static scatters, short-range screened Coulomb disorders, and weak-localization (WL). We establish that the charged impurities are the predominant scatters because there is a strong correlation between the mobility and the charge impurity density. Near the charge neutral point (CNP), the electron-hole puddles that are induced by the charged impurities enhance the inter-valley scattering, which is favorable for WL observations. Away from the CNP, the charged-impurity-induced scattering is weak because of the effective screening by the charge carriers. As a result, the local static structural defects govern the charge transport. Our findings provide compelling evidence for understanding the scattering mechanisms in graphene and pave the way for the improvement of fabrication techniques to achieve high-quality CVD graphene.

  1. Chemical vapor deposition of mesoporous graphene nanoballs for supercapacitor.

    PubMed

    Lee, Jung-Soo; Kim, Sun-I; Yoon, Jong-Chul; Jang, Ji-Hyun

    2013-07-23

    A mass-producible mesoporous graphene nanoball (MGB) was fabricated via a precursor-assisted chemical vapor deposition (CVD) technique for supercapacitor application. Polystyrene balls and reduced iron created under high temperature and a hydrogen gas environment provide a solid carbon source and a catalyst for graphene growth during the precursor-assisted CVD process, respectively. Carboxylic acid and sulfonic acid functionalization of the polystyrene ball facilitates homogeneous dispersion of the hydrophobic polymer template in the metal precursor solution, thus, resulting in a MGB with a uniform number of graphene layers. The MGB is shown to have a specific surface area of 508 m(2)/g and is mesoporous with a mean mesopore diameter of 4.27 nm. Mesopores are generated by the removal of agglomerated iron domains, permeating down through the soft polystyrene spheres and providing the surface for subsequent graphene growth during the heating process in a hydrogen environment. This technique requires only drop-casting of the precursor/polystyrene solution, allowing for mass-production of multilayer MGBs. The supercapacitor fabricated by the use of the MGB as an electrode demonstrates a specific capacitance of 206 F/g and more than 96% retention of capacitance after 10,000 cycles. The outstanding characteristics of the MGB as an electrode for supercapacitors verify the strong potential for use in energy-related areas. PMID:23782238

  2. Growth of graphene underlayers by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Fabiane, Mopeli; Khamlich, Saleh; Bello, Abdulhakeem; Dangbegnon, Julien; Momodu, Damilola; Charlie Johnson, A. T.; Manyala, Ncholu

    2013-11-01

    We present a simple and very convincing approach to visualizing that subsequent layers of graphene grow between the existing monolayer graphene and the copper catalyst in chemical vapor deposition (CVD). Graphene samples were grown by CVD and then transferred onto glass substrates by the bubbling method in two ways, either direct-transfer (DT) to yield poly (methyl methacrylate) (PMMA)/graphene/glass or (2) inverted transfer (IT) to yield graphene/PMMA/glass. Field emission scanning electron microscopy (FE-SEM) and atomic force microscopy (AFM) were used to reveal surface features for both the DT and IT samples. The results from FE-SEM and AFM topographic analyses of the surfaces revealed the underlayer growth of subsequent layers. The subsequent layers in the IT samples are visualized as 3D structures, where the smaller graphene layers lie above the larger layers stacked in a concentric manner. The results support the formation of the so-called "inverted wedding cake" stacking in multilayer graphene growth.

  3. Chemical vapor deposited silica coatings for solar mirror protection

    NASA Technical Reports Server (NTRS)

    Gulino, Daniel A.; Dever, Therese M.; Banholzer, William F.

    1988-01-01

    A variety of techniques is available to apply protective coatings to oxidation susceptible spacecraft components, and each has associated advantages and disadvantages. Film applications by means of chemical vapor deposition (CVD) has the advantage of being able to be applied conformally to objects of irregular shape. For this reason, a study was made of the oxygen plasma durability of thin film (less than 5000 A) silicon dioxide coatings applied by CVD. In these experiments, such coatings were applied to silver mirrors, which are strongly subject to oxidation, and which are proposed for use on the space station solar dynamic power system. Results indicate that such coatings can provide adequate protection without affecting the reflectance of the mirror. Scanning electron micrographs indicated that oxidation of the silver layer did occur at stress crack locations, but this did not affect the measured solar reflectances. Oxidation of the silver did not proceed beyond the immediate location of the crack. Such stress cracks did not occur in thinner silica flims, and hence such films would be desirable for this application.

  4. Aerosol chemical vapor deposition of metal oxide films

    DOEpatents

    Ott, Kevin C.; Kodas, Toivo T.

    1994-01-01

    A process of preparing a film of a multicomponent metal oxide including: forming an aerosol from a solution comprised of a suitable solvent and at least two precursor compounds capable of volatilizing at temperatures lower than the decomposition temperature of said precursor compounds; passing said aerosol in combination with a suitable oxygen-containing carrier gas into a heated zone, said heated zone having a temperature sufficient to evaporate the solvent and volatilize said precursor compounds; and passing said volatilized precursor compounds against the surface of a substrate, said substrate having a sufficient temperature to decompose said volatilized precursor compounds whereby metal atoms contained within said volatilized precursor compounds are deposited as a metal oxide film upon the substrate is disclosed. In addition, a coated article comprising a multicomponent metal oxide film conforming to the surface of a substrate selected from the group consisting of silicon, magnesium oxide, yttrium-stabilized zirconium oxide, sapphire, or lanthanum gallate, said multicomponent metal oxide film characterized as having a substantially uniform thickness upon said FIELD OF THE INVENTION The present invention relates to the field of film coating deposition techniques, and more particularly to the deposition of multicomponent metal oxide films by aerosol chemical vapor deposition. This invention is the result of a contract with the Department of Energy (Contract No. W-7405-ENG-36).

  5. Fundamental studies of the chemical vapor deposition of diamond

    SciTech Connect

    Stevenson, D.A.

    1991-01-01

    The plasma or thermally enhanced low pressure chemical vapor deposition of diamond films is an exciting development with many challenging fundamental problems. The early stages of nucleation is relevant to the initial growth rate and the perfection and morphology of the deposit. To isolate one of the factors that influence nucleation, we have studied the effect of surface topography on the nucleation process. Our earlier work has shown preferential nucleation on sharp convex features and we have proposed several possible reasons for this behavior, including dangling bonds at the convex features. In our recent work, we have extended our investigation to include a novel patterning of silicon substrates used to pattern silicon solar cells. The results are consistent with our earlier observations that the majority of nucleation events occur on protruding surface features. In an effort to establish whether dangling bonds at the protruding surfaces may be responsible for the selective nucleation, we have evaluated the dangling bond concentration using electron spin resonance. We have carried out deposition under nominally identical surface topography, but with different concentrations of dangling bonds at or near the surface. The results of this study indicate that dangling bonds play a minor role in enhancing nucleation, in contrast to a substantial role played by special surface topographical features. In the course of the past year, we have submitted four manuscripts for publication and have made six presentations.

  6. Temperature admittance spectroscopy of boron doped chemical vapor deposition diamond

    SciTech Connect

    Zubkov, V. I. Kucherova, O. V.; Zubkova, A. V.; Ilyin, V. A.; Afanas'ev, A. V.; Bogdanov, S. A.; Vikharev, A. L.; Butler, J. E.

    2015-10-14

    Precision admittance spectroscopy measurements over wide temperature and frequency ranges were carried out for chemical vapor deposition epitaxial diamond samples doped with various concentrations of boron. It was found that the experimentally detected boron activation energy in the samples decreased from 314 meV down to 101 meV with an increase of B/C ratio from 600 to 18000 ppm in the gas reactants. For the heavily doped samples, a transition from thermally activated valence band conduction to hopping within the impurity band (with apparent activation energy 20 meV) was detected at temperatures 120–150 K. Numerical simulation was used to estimate the impurity DOS broadening. Accurate determination of continuously altering activation energy, which takes place during the transformation of conduction mechanisms, was proposed by numerical differentiation of the Arrhenius plot. With increase of boron doping level the gradual decreasing of capture cross section from 3 × 10{sup −13} down to 2 × 10{sup −17} cm{sup 2} was noticed. Moreover, for the hopping conduction the capture cross section becomes 4 orders of magnitude less (∼2 × 10{sup −20} cm{sup 2}). At T > T{sub room} in doped samples the birth of the second conductance peak was observed. We attribute it to a defect, related to the boron doping of the material.

  7. Single crystal diamond detectors grown by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Tuvè, C.; Angelone, M.; Bellini, V.; Balducci, A.; Donato, M. G.; Faggio, G.; Marinelli, M.; Messina, G.; Milani, E.; Morgada, M. E.; Pillon, M.; Potenza, R.; Pucella, G.; Russo, G.; Santangelo, S.; Scoccia, M.; Sutera, C.; Tucciarone, A.; Verona-Rinati, G.

    2007-01-01

    The detection properties of heteropitaxial (polycrystalline, pCVD) and homoepitaxial (single crystal, scCVD) diamond films grown by microwave chemical vapor deposition (CVD) in the Laboratories of Roma "Tor Vergata" University are reported. The pCVD diamond detectors were tested with α-particles from different sources and 12C ions produced by 15 MV Tandem accelerator at Southern National Laboratories (LNS) in Catania (Italy). pCVDs were also used to monitor 14 MeV neutrons produced by the D-T plasma at Joint European Torus (JET), Culham, U.K. The limit of pCVDs is the poor energy resolution. To overcome this problem, we developed scCVD diamonds using the same reactor parameters that optimized pCVD diamonds. scCVD were grown on a low cost (1 0 0) HPHT single crystal substrate. A detector 110 μm thick was tested under α-particles and under 14 MeV neutron irradiation. The charge collection efficiency spectrum measured under irradiation with a triple α-particle source shows three clearly resolved peaks, with an energy resolution of about 1.1%. The measured spectra under neutron irradiation show a well separated C(n,α0)9Be12 reaction peak with an energy spread of 0.5 MeV for 14.8 MeV neutrons and 0.3 MeV for 14.1 MeV neutrons, which are fully compatible with the energy spread of the incident neutron beams.

  8. Review of chemical vapor deposition of graphene and related applications.

    PubMed

    Zhang, Yi; Zhang, Luyao; Zhou, Chongwu

    2013-10-15

    Since its debut in 2004, graphene has attracted enormous interest because of its unique properties. Chemical vapor deposition (CVD) has emerged as an important method for the preparation and production of graphene for various applications since the method was first reported in 2008/2009. In this Account, we review graphene CVD on various metal substrates with an emphasis on Ni and Cu. In addition, we discuss important and representative applications of graphene formed by CVD, including as flexible transparent conductors for organic photovoltaic cells and in field effect transistors. Growth on polycrystalline Ni films leads to both monolayer and few-layer graphene with multiple layers because of the grain boundaries on Ni films. We can greatly increase the percentage of monolayer graphene by using single-crystalline Ni(111) substrates, which have smooth surface and no grain boundaries. Due to the extremely low solubility of carbon in Cu, Cu has emerged as an even better catalyst for the growth of monolayer graphene with a high percentage of single layers. The growth of graphene on Cu is a surface reaction. As a result, only one layer of graphene can form on a Cu surface, in contrast with Ni, where more than one layer can form through carbon segregation and precipitation. We also describe a method for transferring graphene sheets from the metal using polymethyl methacrylate (PMMA). CVD graphene has electronic properties that are potentially valuable in a number of applications. For example, few-layer graphene grown on Ni can function as flexible transparent conductive electrodes for organic photovoltaic cells. In addition, because we can synthesize large-grain graphene on Cu foil, such large-grain graphene has electronic properties suitable for use in field effect transistors. PMID:23480816

  9. Properties of hydrogenated amorphous silicon prepared by chemical vapor deposition

    SciTech Connect

    Ellis, F.B. Jr.; Gordon, R.G.; Paul, W.; Yacobi, B.G.

    1984-06-15

    Hydrogenated amorphous silicon (a-Si:H) films were prepared by chemical vapor deposition (CVD) from mixtures of silane, disilane, trisilane, and higher polysilanes in hydrogen carrier gas at 1 atm total pressure, at substrate temperatures from 420--530 /sup 0/C. Experimental parameters are explained and properties as a function of these parameters are shown. The measurements include hydrogen content (by IR), optical, electrical, and photovoltaic properties of the material. In most respects, the CVD material closely resembles the a-Si:H usually prepared by glow discharge. The following differences have been noted: (1) the CVD a-Si:H shows no IR absorption at 840--850 cm/sup -1/, which is consistent with the expected better thermal stability of the CVD material because of the much higher substrate temperatures in the CVD process than in the glow discharge process. (2) The band gap of CVD a-Si:H is lower by about 0.1 eV than glow discharge a-Si:H of the same hydrogen content. Thus, the band gap of CVD a-Si:H is better matched to the solar spectrum than is glow discharge a-Si:H. (3) All three IR absorption bands due to hydrogen are about 20% narrower in the CVD a-Si:H, suggesting a simpler structure. (4) The temperature dependence of the dark conductivity of CVD a-Si:H fits a curve for a single activation energy, in contrast to the more complicated temperature dependence often found in glow discharge a-Si:H, in which two different activation energies are seen at high and low temperatures. This suggests that the conduction mechanism is also simpler in the CVD a-Si:H.

  10. Forced chemical vapor infiltration of tubular geometries: Modeling, design, and scale-up

    SciTech Connect

    Stinton, D.P.; Besmann, T.M.; Matlin, W.M.; Starr, T.L.; Curtain, W.A.

    1995-10-01

    The development of thick-walled, tubular ceramic composites has involved investigations of different fiber architectures and fixturing to obtain optimal densification and mechanical properties. The current efforts entail modeling of the densification process in order to increase densification uniformity and decrease processing time. In addition, the process is being scaled to produce components with a 10 cm outer diameter.

  11. Chemical reaction between water vapor and stressed glass

    NASA Technical Reports Server (NTRS)

    Soga, N.; Okamoto, T.; Hanada, T.; Kunugi, M.

    1979-01-01

    The crack velocity in soda-lime silicate glass was determined at room temperature at water-vapor pressures of 10 to 0.04 torr using the double torsion technique. A precracked glass specimen (70 x 16 x 1.6 mm) was placed in a vacuum chamber containing a four-point bending test apparatus. The plotted experimental results show that the crack propagation curve in water agrees fairly well with that of Wiederhorn (1967). Attention is given to the effect of water vapor pressure on crack velocity at K(I) = 550,000 N/m to the 3/2 power, with (Wiederhorn's data) or without N2 present. The plotted results reveal that the present crack velocity is about two orders of magnitude higher than that of Wiederhorn at high water-vapor conditions, but the difference decreases as the water-vapor concentration diminishes or the crack velocity slows down.

  12. Chemical vapor discrimination using a compact and low-power array of piezoresistive microcantilevers.

    PubMed

    Loui, Albert; Ratto, Timothy V; Wilson, Thomas S; McCall, Scott K; Mukerjee, Erik V; Love, Adam H; Hart, Bradley R

    2008-05-01

    A compact and low-power microcantilever-based sensor array has been developed and used to detect various chemical vapor analytes. In contrast to earlier micro-electro-mechanical systems (MEMS) array sensors, this device uses the static deflection of piezoresistive cantilevers due to the swelling of glassy polyolefin coatings during sorption of chemical vapors. To maximize the sensor response to a variety of chemical analytes, the polymers are selected based on their Hildebrand solubility parameters to span a wide range of chemical properties. We utilize a novel microcontact spotting method to reproducibly coat a single side of each cantilever in the array with the polymers. To demonstrate the utility of the sensor array we have reproducibly detected 11 chemical vapors, representing a breadth of chemical properties, in real time and over a wide range of vapor concentrations. We also report the detection of the chemical warfare agents (CWAs) VX and sulfur mustard (HD), representing the first published report of CWA vapor detection by a polymer-based, cantilever sensor array. Comparisons of the theoretical polymer/vapor partition coefficient to the experimental cantilever deflection responses show that, while general trends can be reasonably predicted, a simple linear relationship does not exist. PMID:18427681

  13. Application of pulsed-uv laser Raman spectroscopy to chemical vapor deposition

    SciTech Connect

    Hargis, P.J. Jr.

    1981-01-01

    Raman detection limits obtained with a KrF laser excitation source were comparable to those obtained by laser-induced fluorescence and photofragment emission spectroscopy under chemical vapor deposition conditions.

  14. Melt Infiltration and the Thermal-Chemical Corrosion of the Lithosphere-Asthenosphere Boundary

    NASA Astrophysics Data System (ADS)

    Havlin, C.; Holtzman, B. K.; Roy, M.; Gaherty, J. B.; Plank, T. A.

    2015-12-01

    This study investigates the corrosion of the base of the lithosphere by heat and water transport facilitated by infiltrating melt. The origin of the rapid drop in seismic velocity observed near the lithosphere-asthenosphere boundary (LAB) in many locations across the globe is thought to arise from either melt accumulation or a transition from dry lithosphere to hydrated asthenosphere. However, these two hypotheses are difficult to decouple; water lowers the peridotite solidus and melt will transport water due to its incompatibility with the crystalline matrix. To investigate the chemical and thermal evolution of the LAB, we construct forward models of the two-phase system describing 1D mass, momentum and energy conservation in melt and solid phases, including volatile transport and using a water-dependent solidus. In addition to 1D models, 2D models are used to investigate how both geometric and dynamic pressure-driven melt focusing may influence LAB topography. Using relationships between thermodynamic variables and elastic properties we predict seismic velocities and attenuation measurements that are compared directly to EarthScope measurements in the western U.S.. In addition to geophysical observations, the evolution of water content and accumulation zone depth are compared to observed equilibration depth and water contents of magmas from localities in the Basin and Range and the western margin of the Colorado Plateau. Preliminary modeling results in 1D show that in an open system where solid material upwells continuously beneath the LAB, water concentration in the melt increases at the upper boundary of the partially molten zone where crystallization occurs. This leads to a potential feedback wherein the increasing water content locally hydrates the base of the lithosphere, lowering its solidus, and generating melt that can migrate to shallower depths.

  15. Chemical vapor deposition of fluorine-doped zinc oxide

    DOEpatents

    Gordon, Roy G.; Kramer, Keith; Liang, Haifan

    2000-06-06

    Fims of fluorine-doped zinc oxide are deposited from vaporized precursor compounds comprising a chelate of a dialkylzinc, such as an amine chelate, an oxygen source, and a fluorine source. The coatings are highly electrically conductive, transparent to visible light, reflective to infrared radiation, absorbing to ultraviolet light, and free of carbon impurity.

  16. Magnetorheological finishing of chemical-vapor deposited zinc sulfide via chemically and mechanically modified fluids

    DOE PAGESBeta

    Salzman, Sivan; Romanofsky, Henry J.; Giannechini, Lucca J.; Jacobs, Stephen D.; Lambropoulos, John C.

    2016-02-19

    In this study, we describe the anisotropy in the material removal rate (MRR) of the polycrystalline, chemical-vapor deposited zinc sulfide (ZnS).We define the polycrystalline anisotropy via microhardness and chemical erosion tests for four crystallographic orientations of ZnS: (100), (110), (111), and (311). Anisotropy in the MRR was studied under magnetorheological finishing (MRF) conditions. Three chemically and mechanically modified magnetorheological (MR) fluids at pH values of 4, 5, and 6 were used to test the MRR variations among the four single-crystal planes. When polishing the single-crystal planes and the polycrystalline with pH 5 and pH 6MR fluids, variations were found inmore » the MRR among the four single-crystal planes and surface artifacts were observed on the polycrystalline material. When polishing the single-crystal planes and the polycrystalline with the modified MR fluid at pH 4, however, minimal variation was observed in the MRR among the four orientations and a reduction in surface artifacts was achieved on the polycrystalline material.« less

  17. Magnetorheological finishing of chemical-vapor deposited zinc sulfide via chemically and mechanically modified fluids.

    PubMed

    Salzman, Sivan; Romanofsky, Henry J; Giannechini, Lucca J; Jacobs, Stephen D; Lambropoulos, John C

    2016-02-20

    We describe the anisotropy in the material removal rate (MRR) of the polycrystalline, chemical-vapor deposited zinc sulfide (ZnS). We define the polycrystalline anisotropy via microhardness and chemical erosion tests for four crystallographic orientations of ZnS: (100), (110), (111), and (311). Anisotropy in the MRR was studied under magnetorheological finishing (MRF) conditions. Three chemically and mechanically modified magnetorheological (MR) fluids at pH values of 4, 5, and 6 were used to test the MRR variations among the four single-crystal planes. When polishing the single-crystal planes and the polycrystalline with pH 5 and pH 6 MR fluids, variations were found in the MRR among the four single-crystal planes and surface artifacts were observed on the polycrystalline material. When polishing the single-crystal planes and the polycrystalline with the modified MR fluid at pH 4, however, minimal variation was observed in the MRR among the four orientations and a reduction in surface artifacts was achieved on the polycrystalline material. PMID:26906603

  18. Potentiometric detection of chemical vapors using molecularly imprinted polymers as receptors

    PubMed Central

    Liang, Rongning; Chen, Lusi; Qin, Wei

    2015-01-01

    Ion-selective electrode (ISE) based potentiometric gas sensors have shown to be promising analytical tools for detection of chemical vapors. However, such sensors are only capable of detecting those vapors which can be converted into ionic species in solution. This paper describes for the first time a polymer membrane ISE based potentiometric sensing system for sensitive and selective determination of neutral vapors in the gas phase. A molecularly imprinted polymer (MIP) is incorporated into the ISE membrane and used as the receptor for selective adsorption of the analyte vapor from the gas phase into the sensing membrane phase. An indicator ion with a structure similar to that of the vapor molecule is employed to indicate the change in the MIP binding sites in the membrane induced by the molecular recognition of the vapor. The toluene vapor is used as a model and benzoic acid is chosen as its indicator. Coupled to an apparatus manifold for preparation of vapor samples, the proposed ISE can be utilized to determine volatile toluene in the gas phase and allows potentiometric detection down to parts per million levels. This work demonstrates the possibility of developing a general sensing principle for detection of neutral vapors using ISEs. PMID:26215887

  19. Potentiometric detection of chemical vapors using molecularly imprinted polymers as receptors.

    PubMed

    Liang, Rongning; Chen, Lusi; Qin, Wei

    2015-01-01

    Ion-selective electrode (ISE) based potentiometric gas sensors have shown to be promising analytical tools for detection of chemical vapors. However, such sensors are only capable of detecting those vapors which can be converted into ionic species in solution. This paper describes for the first time a polymer membrane ISE based potentiometric sensing system for sensitive and selective determination of neutral vapors in the gas phase. A molecularly imprinted polymer (MIP) is incorporated into the ISE membrane and used as the receptor for selective adsorption of the analyte vapor from the gas phase into the sensing membrane phase. An indicator ion with a structure similar to that of the vapor molecule is employed to indicate the change in the MIP binding sites in the membrane induced by the molecular recognition of the vapor. The toluene vapor is used as a model and benzoic acid is chosen as its indicator. Coupled to an apparatus manifold for preparation of vapor samples, the proposed ISE can be utilized to determine volatile toluene in the gas phase and allows potentiometric detection down to parts per million levels. This work demonstrates the possibility of developing a general sensing principle for detection of neutral vapors using ISEs. PMID:26215887

  20. Potentiometric detection of chemical vapors using molecularly imprinted polymers as receptors

    NASA Astrophysics Data System (ADS)

    Liang, Rongning; Chen, Lusi; Qin, Wei

    2015-07-01

    Ion-selective electrode (ISE) based potentiometric gas sensors have shown to be promising analytical tools for detection of chemical vapors. However, such sensors are only capable of detecting those vapors which can be converted into ionic species in solution. This paper describes for the first time a polymer membrane ISE based potentiometric sensing system for sensitive and selective determination of neutral vapors in the gas phase. A molecularly imprinted polymer (MIP) is incorporated into the ISE membrane and used as the receptor for selective adsorption of the analyte vapor from the gas phase into the sensing membrane phase. An indicator ion with a structure similar to that of the vapor molecule is employed to indicate the change in the MIP binding sites in the membrane induced by the molecular recognition of the vapor. The toluene vapor is used as a model and benzoic acid is chosen as its indicator. Coupled to an apparatus manifold for preparation of vapor samples, the proposed ISE can be utilized to determine volatile toluene in the gas phase and allows potentiometric detection down to parts per million levels. This work demonstrates the possibility of developing a general sensing principle for detection of neutral vapors using ISEs.

  1. Mathematical Analysis and Optimization of Infiltration Processes

    NASA Technical Reports Server (NTRS)

    Chang, H.-C.; Gottlieb, D.; Marion, M.; Sheldon, B. W.

    1997-01-01

    A variety of infiltration techniques can be used to fabricate solid materials, particularly composites. In general these processes can be described with at least one time dependent partial differential equation describing the evolution of the solid phase, coupled to one or more partial differential equations describing mass transport through a porous structure. This paper presents a detailed mathematical analysis of a relatively simple set of equations which is used to describe chemical vapor infiltration. The results demonstrate that the process is controlled by only two parameters, alpha and beta. The optimization problem associated with minimizing the infiltration time is also considered. Allowing alpha and beta to vary with time leads to significant reductions in the infiltration time, compared with the conventional case where alpha and beta are treated as constants.

  2. Si Passivation and Chemical Vapor Deposition of Silicon Nitride: Final Technical Report, March 18, 2007

    SciTech Connect

    Atwater, H. A.

    2007-11-01

    This report investigated chemical and physical methods for Si surface passivation for application in crystalline Si and thin Si film photovoltaic devices. Overall, our efforts during the project were focused in three areas: i) synthesis of silicon nitride thin films with high hydrogen content by hot-wire chemical vapor deposition; ii) investigation of the role of hydrogen passivation of defects in crystalline Si and Si solar cells by out diffusion from hydrogenated silicon nitride films; iii) investigation of the growth kinetics and passivation of hydrogenated polycrystalline. Silicon nitride films were grown by hot-wire chemical vapor deposition and film properties have been characterized as a function of SiH4/NH3 flow ratio. It was demonstrated that hot-wire chemical vapor deposition leads to growth of SiNx films with controllable stoichiometry and hydrogen.

  3. Industrial Scale Synthesis of Carbon Nanotubes Via Fluidized Bed Chemical Vapor Deposition: A Senior Design Project

    ERIC Educational Resources Information Center

    Smith, York R.; Fuchs, Alan; Meyyappan, M.

    2010-01-01

    Senior year chemical engineering students designed a process to produce 10 000 tonnes per annum of single wall carbon nanotubes (SWNT) and also conducted bench-top experiments to synthesize SWNTs via fluidized bed chemical vapor deposition techniques. This was an excellent pedagogical experience because it related to the type of real world design…

  4. Metalorganic chemical vapor deposition of gallium nitride on sacrificial substrates

    NASA Astrophysics Data System (ADS)

    Fenwick, William Edward

    GaN-based light emitting diodes (LEDs) face several challenges if the technology is to continue to make a significant impact in general illumination, and on technology that has become known as solid state lighting (SSL). Two of the most pressing challenges for the continued penetration of SSL into traditional lighting applications are efficacy and total lumens from the device, and their related cost. The development of alternative substrate technologies is a promising avenue toward addressing both of these challenges, as both GaN-based device technology and the associated metalorganic chemical vapor deposition (MOCVD) technology are already relatively mature technologies with a well-understood cost base. Zinc oxide (ZnO) and silicon (Si) are among the most promising alternative substrates for GaN epitaxy. These substrates offer the ability to access both higher efficacy and lumen devices (ZnO) at a much reduced cost. This work focuses on the development of MOCVD growth processes to yield high quality GaN-based materials and devices on both ZnO and Si. ZnO is a promising substrate for growth of low defect-density GaN because of its similar lattice constant and thermal expansion coefficient. The major hurdles for GaN growth on ZnO are the instability of the substrate in a hydrogen atmosphere, which is typical of nitride growth conditions, and the inter-diffusion of zinc and oxygen from the substrate into the GaN-based epitaxial layer. A process was developed for the MOCVD growth of GaN and InxGa 1-xN on ZnO that attempted to address these issues. The structural and optical properties of these films were studied using various techniques. X-ray diffraction (XRD) showed the growth of wurtzite GaN on ZnO, and room-temperature photoluminescence (RT-PL) showed near band-edge luminescence from the GaN and InxGa1-xN layers. However, high zinc and oxygen concentrations due to interdiffusion near the ZnO substrate remained an issue; therefore, the diffusion of zinc and oxygen

  5. A model for chemical and isotopic fractionation in the lunar regolith by impact vaporization

    NASA Technical Reports Server (NTRS)

    Housley, R. M.

    1979-01-01

    Up until now there has been no complete model of chemical and isotopic fractionation effects which could occur in the lunar regolith as a result of hypervelocity impact vaporization. Previous work on the outlines for such a model are extended and show that impact vaporization could be an efficient mechanism for producing heavy isotope enrichments. Rough qualitative predictions based on the model show a general similarity to the observations on lunar samples.

  6. Controlled VLS Growth of Indium, Gallium and Tin Oxide Nanowiresvia Chemical Vapor Transport

    SciTech Connect

    Johnson, M.C.; Aloni, S.; McCready, D.E.; Bourret-Courchesne, E.D.

    2006-03-13

    We utilized a vapor-liquid-solid growth technique to synthesize indium oxide, gallium oxide, and tin oxide nanowires using chemical vapor transport with gold nanoparticles as the catalyst. Using identical growth parameters we were able to synthesize single crystal nanowires typically 40-100 nm diameter and more than 10-100 microns long. The products were characterized by means of XRD, SEM and HRTEM. All the wires were grown under the same growth conditions with growth rates inversely proportional to the source metal vapor pressure. Initial experiments show that different transparent oxide nanowires can be grown simultaneously on a single substrate with potential application for multi-component gas sensors.

  7. Application of laser Doppler velocimeter to chemical vapor laser system

    NASA Technical Reports Server (NTRS)

    Gartrell, Luther R.; Hunter, William W., Jr.; Lee, Ja H.; Fletcher, Mark T.; Tabibi, Bagher M.

    1993-01-01

    A laser Doppler velocimeter (LDV) system was used to measure iodide vapor flow fields inside two different-sized tubes. Typical velocity profiles across the laser tubes were obtained with an estimated +/-1 percent bias and +/-0.3 to 0.5 percent random uncertainty in the mean values and +/-2.5 percent random uncertainty in the turbulence-intensity values. Centerline velocities and turbulence intensities for various longitudinal locations ranged from 13 to 17.5 m/sec and 6 to 20 percent, respectively. In view of these findings, the effects of turbulence should be considered for flow field modeling. The LDV system provided calibration data for pressure and mass flow systems used routinely to monitor the research laser gas flow velocity.

  8. Method and apparatus for detection of chemical vapors

    SciTech Connect

    Mahurin, Shannon Mark; Dai, Sheng; Caja, Josip

    2007-05-15

    The present invention is a gas detector and method for using the gas detector for detecting and identifying volatile organic and/or volatile inorganic substances present in unknown vapors in an environment. The gas detector comprises a sensing means and a detecting means for detecting electrical capacitance variance of the sensing means and for further identifying the volatile organic and volatile inorganic substances. The sensing means comprises at least one sensing unit and a sensing material allocated therein the sensing unit. The sensing material is an ionic liquid which is exposed to the environment and is capable of dissolving a quantity of said volatile substance upon exposure thereto. The sensing means constitutes an electrochemical capacitor and the detecting means is in electrical communication with the sensing means.

  9. A new whole-body vapor exposure chamber for protection performance research on chemical protective ensembles.

    PubMed

    Duncan, E J Scott; Dickson, Eva F Gudgin

    2003-01-01

    A chemical vapor exposure chamber was designed to permit the study of whole-body vapor exposure of individuals wearing full protective clothing and equipment systems. A methodology also was developed to quantify the vapor protection performance of chemical protective ensembles (CPE) under safe and validated laboratory procedures. The principal research objectives were to (1) provide a methodology to accurately assess the performance of CPE and equipment under different environmental and chemical vapor challenge conditions; (2) quantify the vapor protection on a per body region basis; (3) have a systems level tool to aid in the research and development of more effective CPE for use in chemical biological environments; and (4) have a safe and reliable means of qualifying new CPE on the basis of vapor protection. Although designed for the evaluation of military-style protective equipment, the procedures apply equally to other styles of CPE used by civilian agencies such as firefighters, police, and hazmat units. The chamber and methodology were specifically designed to examine the vapor protection performance of clothing ensembles, including the details of protection variation over the body. A variety of exposure conditions appropriate to indoor and outdoor scenarios are possible, including the effects of wind, temperature, and relative humidity. Protection performance results from a number of individuals wearing typical military-style CPE are presented. These results demonstrate that there is no such thing as a unique protection performance level obtained for a given CPE. Rather, the individual and the ensemble interact differently in each situation, resulting in a protection performance distribution for individuals, and for groups of wearers, even under a standardized set of exposure conditions. PMID:12688845

  10. Solar-induced chemical vapor deposition of diamond-type carbon films

    DOEpatents

    Pitts, J. Roland; Tracy, C. Edwin; King, David E.; Stanley, James T.

    1994-01-01

    An improved chemical vapor deposition method for depositing transparent continuous coatings of sp.sup.3 -bonded diamond-type carbon films, comprising: a) providing a volatile hydrocarbon gas/H.sub.2 reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and b) directing a concentrated solar flux of from about 40 to about 60 watts/cm.sup.2 through said reactant mixture to produce substrate temperatures of about 750.degree. C. to about 950.degree. C. to activate deposition of the film on said substrate.

  11. Solar-induced chemical vapor deposition of diamond-type carbon films

    DOEpatents

    Pitts, J.R.; Tracy, C.E.; King, D.E.; Stanley, J.T.

    1994-09-13

    An improved chemical vapor deposition method for depositing transparent continuous coatings of sp[sup 3]-bonded diamond-type carbon films, comprises: (a) providing a volatile hydrocarbon gas/H[sub 2] reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and (b) directing a concentrated solar flux of from about 40 to about 60 watts/cm[sup 2] through said reactant mixture to produce substrate temperatures of about 750 C to about 950 C to activate deposition of the film on said substrate. 11 figs.

  12. Methyl isocyanate liquid and vapor permeation through selected respirator diaphragms and chemical protective clothing

    SciTech Connect

    Berardinelli, S.P.; Moyer, E.S.

    1987-04-01

    Initially, a study was undertaken to evaluate selected chemical protective clothing suitable for use by emergency response personnel confronted with methyl isocyanate (MIC). Twenty-two chemical protective clothing materials were tested against liquid methyl isocyanate. Chemical permeation breakthrough times for these clothing materials demonstrate that only one of these garments can be considered as a candidate material against liquid MIC. In a subsequent study, three chemical protective clothing materials were evaluated against approximately 800 ppm MIC vapor. Chemical permeation breakthrough times demonstrate that these materials can be considered candidate materials. A final study tested self-contained breathing apparatus (SCBA) diaphragms. Four SCBA diaphragms were tested and all experienced rapid breakthrough when exposed to liquid MIC. Next, three SCBA diaphragms were exposed to approximately 800 ppm MIC vapor. The data demonstrate that the SCBA should be worn inside a total encapsulating suit.

  13. Selected area chemical vapor deposition of thin films for conductometric microelectronic chemical sensors

    NASA Astrophysics Data System (ADS)

    Majoo, Sanjeev

    Recent advances in microelectronics and silicon processing have been exploited to fabricate miniaturized chemical sensors. Although the capability of chemical sensing technology has grown steadily, it has been outpaced by the increasing demands for more reliable, inexpensive, and selective sensors. The diversity of applications requires the deployment of different sensing materials that have rich interfacial chemistry. However, several promising sensor materials are often incompatible with silicon micromachining and their deposition requires complicated masking steps. The new approach described here is to first micromachine a generic, instrumented, conductometric, microelectronic sensor platform that is fully functional except for the front-end sensing element. This generic platform contains a thin dielectric membrane, an integrated boron-doped silicon heater, and conductance electrodes. The membrane has low thermal mass and excellent thermal isolation. A proprietary selected-area chemical vapor deposition (SACVD) process in a cold-wall reactor at low pressures was then used to achieve maskless, self-lithographic deposition of thin films. The temperature-programmable integrated microheater initiates localized thermal decomposition/reaction of suitable CVD precursors confined to a small heated area (500 mum in diameter), and this creates the active sensing element. Platinum and titania (TiOsb2) films were deposited from pyrolysis of organometallic precursors, tetrakistrifluorophosphine platinum Pt(PFsb3)sb4 and titanium tetraisopropoxide Ti(OCH(CHsb3)sb2rbrack sb4, respectively. Deposition of gold metal films from chlorotriethylphosphine gold (Csb2Hsb5)sb3PAuCl precursor was also attempted but without success. The conductance electrodes permit in situ monitoring of film growth. The as-deposited films were characterized in situ by conductance measurements and optical microscopy and ex situ by electron microscopy and spectroscopy methods. Devices equipped with

  14. Reduced chemical warfare agent sorption in polyurethane-painted surfaces via plasma-enhanced chemical vapor deposition of perfluoroalkanes.

    PubMed

    Gordon, Wesley O; Peterson, Gregory W; Durke, Erin M

    2015-04-01

    Perfluoralkalation via plasma chemical vapor deposition has been used to improve hydrophobicity of surfaces. We have investigated this technique to improve the resistance of commercial polyurethane coatings to chemicals, such as chemical warfare agents. The reported results indicate the surface treatment minimizes the spread of agent droplets and the sorption of agent into the coating. The improvement in resistance is likely due to reduction of the coating's surface free energy via fluorine incorporation, but may also have contributing effects from surface morphology changes. The data indicates that plasma-based surface modifications may have utility in improving chemical resistance of commercial coatings. PMID:25775244

  15. Effect of irrigation with treated wastewater on soil chemical properties and infiltration rate.

    PubMed

    Bedbabis, Saida; Ben Rouina, Béchir; Boukhris, Makki; Ferrara, Giuseppe

    2014-01-15

    In Tunisia, water scarcity is one of the major constraints for agricultural activities. The reuse of treated wastewater (TWW) in agriculture can be a sustainable solution to face water scarcity. The research was conducted for a period of four years in an olive orchard planted on a sandy soil and subjected to irrigation treatments: a) rain-fed conditions (RF), as control b) well water (WW) and c) treated wastewater (TWW). In WW and TWW treatments, an annual amount of 5000 m(3) ha(-1) of water was supplied to the orchard. Soil samples were collected at the beginning of the study and after four years for each treatment. The main soil properties such as electrical conductivity (EC), pH, soluble cations, chloride (Cl(-)), sodium adsorption ratio (SAR), organic matter (OM) as well as the infiltration rate were investigated. After four years, either a significant decrease of pH and infiltration rate or a significant increase of OM, SAR and EC were observed in the soil subjected to treated wastewater treatment. PMID:24361727

  16. Chemical-vapor deposition of complex oxides: materials and process development

    SciTech Connect

    Muenchausen, R.

    1996-11-01

    This is the final report of a six-month, Laboratory-Directed Research and Development (LDRD) project at the Los Alamos National Laboratory (LANL) part of the Advanced Materials Laboratory (AML). The demand for higher performance and lower cost in electronics is driving the need for advanced materials and consequent process integration. Ceramic thin-film technology is becoming more important in the manufacture of microelectronic devices, photovoltaics, optoelectronics, magneto-optics, sensors, microwave, and radio frequency communication devices, and high-Tc superconducting tapes. A flexible processing approach for potential large-scale manufacturing of novel electronic ceramic thin films is desirable. Current thin- film deposition technologies based on physical vapor-deposition techniques are limited in scale potential and have limited control of processing parameters. The lack of control over multiple process parameters inhibits the versatility and reproducibility of the physical vapor deposition processes applied to complex oxides. Chemical vapor deposition is emerging as a viable approach for large- scale manufacturing of electronic materials. Specifically, the ability to control more processing parameters with chemical vapor deposition than with other processing techniques provides the reliability and material property reproducibility required by manufacturing. This project sought to investigate the chemical vapor deposition of complex oxides.

  17. Evaluation of Chemical Warfare Agent Percutaneous Vapor Toxicity: Derivation of Toxicity Guidelines for Assessing Chemical Protective Ensembles.

    SciTech Connect

    Watson, A.P.

    2003-07-24

    Percutaneous vapor toxicity guidelines are provided for assessment and selection of chemical protective ensembles (CPEs) to be used by civilian and military first responders operating in a chemical warfare agent vapor environment. The agents evaluated include the G-series and VX nerve agents, the vesicant sulfur mustard (agent HD) and, to a lesser extent, the vesicant Lewisite (agent L). The focus of this evaluation is percutaneous vapor permeation of CPEs and the resulting skin absorption, as inhalation and ocular exposures are assumed to be largely eliminated through use of SCBA and full-face protective masks. Selection of appropriately protective CPE designs and materials incorporates a variety of test parameters to ensure operability, practicality, and adequacy. One aspect of adequacy assessment should be based on systems tests, which focus on effective protection of the most vulnerable body regions (e.g., the groin area), as identified in this analysis. The toxicity range of agent-specific cumulative exposures (Cts) derived in this analysis can be used as decision guidelines for CPE acceptance, in conjunction with weighting consideration towards more susceptible body regions. This toxicity range is bounded by the percutaneous vapor estimated minimal effect (EME{sub pv}) Ct (as the lower end) and the 1% population threshold effect (ECt{sub 01}) estimate. Assumptions of exposure duration used in CPE certification should consider that each agent-specific percutaneous vapor cumulative exposure Ct for a given endpoint is a constant for exposure durations between 30 min and 2 hours.

  18. Physico-chemical mechanism for the vapors sensitivity of photoluminescent InP quantum dots

    NASA Astrophysics Data System (ADS)

    Prosposito, P.; De Angelis, R.; De Matteis, F.; Hatami, F.; Masselink, W. T.; Zhang, H.; Casalboni, M.

    2016-03-01

    InP/InGaP surface quantum dots are interesting materials for optical chemical sensors since they present an intense emission at room temperature, whose intensity changes rapidly and reversibly depending on the composition of the environmental atmosphere. We present here their emission properties by time resolved photoluminescence spectroscopy investigation and we discuss the physico-chemical mechanism behind their sensitivity to the surrounding atmosphere. Photoluminescence transients in inert atmosphere (N2) and in solvent vapours of methanol, clorophorm, acetone and water were measured. The presence of vapors of clorophorm, acetone and water showed a very weak effect on the transient times, while an increase of up to 15% of the decay time was observed for methanol vapour exposure. On the basis of the vapor molecule nature (polarity, proticity, steric hindrance, etc.) and of the interaction of the vapor molecules with the quantum dots surface a sensing mechanism involving quantum dots non-radiative surface states is proposed.

  19. Silicon epitaxy using tetrasilane at low temperatures in ultra-high vacuum chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Hazbun, Ramsey; Hart, John; Hickey, Ryan; Ghosh, Ayana; Fernando, Nalin; Zollner, Stefan; Adam, Thomas N.; Kolodzey, James

    2016-06-01

    The deposition of silicon using tetrasilane as a vapor precursor is described for an ultra-high vacuum chemical vapor deposition tool. The growth rates and morphology of the Si epitaxial layers over a range of temperatures and pressures are presented. The layers were characterized using transmission electron microscopy, x-ray diffraction, spectroscopic ellipsometry, Atomic Force Microscopy, and secondary ion mass spectrometry. Based on this characterization, high quality single crystal silicon epitaxy was observed. Tetrasilane was found to produce higher growth rates relative to lower order silanes, with the ability to deposit crystalline Si at low temperatures (T=400 °C), with significant amorphous growth and reactivity measured as low as 325 °C, indicating the suitability of tetrasilane for low temperature chemical vapor deposition such as for SiGeSn alloys.

  20. Chemical hazards present in liquids and vapors of electronic cigarettes.

    PubMed

    Hutzler, Christoph; Paschke, Meike; Kruschinski, Svetlana; Henkler, Frank; Hahn, Jürgen; Luch, Andreas

    2014-07-01

    Electronic (e-)cigarettes have emerged in recent years as putative alternative to conventional tobacco cigarettes. These products do not contain typical carcinogens that are present in tobacco smoke, due to the lack of combustion. However, besides nicotine, hazards can also arise from other constituents of liquids, such as solvents, flavors, additives and contaminants. In this study, we have analyzed 28 liquids of seven manufacturers purchased in Germany. We confirm the presence of a wide range of flavors to enhance palatability. Although glycerol and propylene glycol were detected in all samples, these solvents had been replaced by ethylene glycol as dominant compound in five products. Ethylene glycol is associated with markedly enhanced toxicological hazards when compared to conventionally used glycerol and propylene glycol. Additional additives, such as coumarin and acetamide, that raise concerns for human health were detected in certain samples. Ten out of 28 products had been declared "free-of-nicotine" by the manufacturer. Among these ten, seven liquids were identified containing nicotine in the range of 0.1-15 µg/ml. This suggests that "carry over" of ingredients may occur during the production of cartridges. We have further analyzed the formation of carbonylic compounds in one widely distributed nicotine-free brand. Significant amounts of formaldehyde, acetaldehyde and propionaldehyde were only found at 150 °C by headspace GC-MS analysis. In addition, an enhanced formation of aldehydes was found in defined puff fractions, using an adopted machine smoking protocol. However, this effect was delayed and only observed during the last third of the smoking procedure. In the emissions of these fractions, which represent up to 40 % of total vapor volume, similar levels of formaldehyde were detected when compared to conventional tobacco cigarettes. By contrast, carbonylic compounds were hardly detectable in earlier collected fractions. Our data demonstrate the

  1. Development of a Computational Chemical Vapor Deposition Model: Applications to Indium Nitride and Dicyanovinylaniline

    NASA Technical Reports Server (NTRS)

    Cardelino, Carlos

    1999-01-01

    A computational chemical vapor deposition (CVD) model is presented, that couples chemical reaction mechanisms with fluid dynamic simulations for vapor deposition experiments. The chemical properties of the systems under investigation are evaluated using quantum, molecular and statistical mechanics models. The fluid dynamic computations are performed using the CFD-ACE program, which can simulate multispecies transport, heat and mass transfer, gas phase chemistry, chemistry of adsorbed species, pulsed reactant flow and variable gravity conditions. Two experimental setups are being studied, in order to fabricate films of: (a) indium nitride (InN) from the gas or surface phase reaction of trimethylindium and ammonia; and (b) 4-(1,1)dicyanovinyl-dimethylaminoaniline (DCVA) by vapor deposition. Modeling of these setups requires knowledge of three groups of properties: thermodynamic properties (heat capacity), transport properties (diffusion, viscosity, and thermal conductivity), and kinetic properties (rate constants for all possible elementary chemical reactions). These properties are evaluated using computational methods whenever experimental data is not available for the species or for the elementary reactions. The chemical vapor deposition model is applied to InN and DCVA. Several possible InN mechanisms are proposed and analyzed. The CVD model simulations of InN show that the deposition rate of InN is more efficient when pulsing chemistry is used under conditions of high pressure and microgravity. An analysis of the chemical properties of DCVA show that DCVA dimers may form under certain conditions of physical vapor transport. CVD simulations of the DCVA system suggest that deposition of the DCVA dimer may play a small role in the film and crystal growth processes.

  2. Dopant gas effect on silicon chemical vapor depositions: A surface potential model

    NASA Technical Reports Server (NTRS)

    Chang, C. A.

    1975-01-01

    A surface potential model is proposed to consistently explain the known dopant gas effects on silicon chemical vapor deposition. This model predicts that the effects of the same dopant gases on the diamond deposition rate using methane and carbon tetrachloride should be opposite and similar to those of silane, respectively. Available data are in agreement with this prediction.

  3. Miscellaneous chemical basin treatability study: an analysis of passive soil vapor extraction wells (PSVE)

    SciTech Connect

    Riha, B.; Rossabi, J.

    1997-12-01

    A passive soil vapor extraction (PSVE) treatability study at the Miscellaneous Chemical Basin (MCB) of the Savannah River Site (SRS) has been progressing since September 1996. The results to date on the treatability study of the PSVE system indicate that the technology is performing well.

  4. VAPORIZATION TECHNIQUE TO MEASURE MUTAGENIC ACTIVITY OF VOLATILE ORGANIC CHEMICALS IN THE AMES/'SALOMELLA' ASSAY

    EPA Science Inventory

    The purpose of the research was to develop and characterize a sensitive test method to detect mutagenic activity of volatile liquid organic chemicals (i.e., volatiles) in the Ames/Salmonella assay. A Tedlar bag vaporization technique was developed which increased contact time bet...

  5. VAPOR SAMPLING DEVICE FOR INTERFACE WITH MICROTOX ASSAY FOR SCREENING TOXIC INDUSTRIAL CHEMICALS

    EPA Science Inventory

    A time-integrated sampling system interfaced with a toxicity-based assay is reported for monitoring volatile toxic industrial chemicals (TICs). Semipermeable membrane devices (SPMDs) using dimethyl sulfoxide (DMSO) as the fill solvent accumulated each of 17 TICs from the vapor...

  6. High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells.

    PubMed

    He, Rongrui; Day, Todd D; Sparks, Justin R; Sullivan, Nichole F; Badding, John V

    2016-07-01

    Thin films of hydrogenated amorphous silicon can be produced at MPa pressures from silane without the use of plasma at temperatures as low as 345 °C. High pressure chemical vapor deposition may open a new way to low cost deposition of amorphous silicon solar cells and other thin film structures over very large areas in very compact, simple reactors. PMID:27174318

  7. Low temperature junction growth using hot-wire chemical vapor deposition

    DOEpatents

    Wang, Qi; Page, Matthew; Iwaniczko, Eugene; Wang, Tihu; Yan, Yanfa

    2014-02-04

    A system and a process for forming a semi-conductor device, and solar cells (10) formed thereby. The process includes preparing a substrate (12) for deposition of a junction layer (14); forming the junction layer (14) on the substrate (12) using hot wire chemical vapor deposition; and, finishing the semi-conductor device.

  8. Chemical vapor deposition of W-Si-N and W-B-N

    DOEpatents

    Fleming, James G.; Roherty-Osmun, Elizabeth Lynn; Smith, Paul M.; Custer, Jonathan S.; Jones, Ronald V.; Nicolet, Marc-A.; Madar, Roland; Bernard, Claude

    1999-01-01

    A method of depositing a ternary, refractory based thin film on a substrate by chemical vapor deposition employing precursor sources of tungsten comprising WF.sub.6, either silicon or boron, and nitrogen. The result is a W--Si--N or W--B--N thin film useful for diffusion barrier and micromachining applications.

  9. Chemical vapor deposition of W-Si-N and W-B-N

    DOEpatents

    Fleming, J.G.; Roherty-Osmun, E.L.; Smith, P.M.; Custer, J.S.; Jones, R.V.; Nicolet, M.; Madar, R.; Bernard, C.

    1999-06-29

    A method of depositing a ternary, refractory based thin film on a substrate by chemical vapor deposition employing precursor sources of tungsten comprising WF[sub 6], either silicon or boron, and nitrogen. The result is a W-Si-N or W-B-N thin film useful for diffusion barrier and micromachining applications. 10 figs.

  10. All-Hot-Wire Chemical Vapor Deposition a-Si:H Solar Cells

    SciTech Connect

    Iwaniczko, E.; Wang, Q.; Xu, Y.; Nelson, B. P.; Mahan, A. H.; Crandall, R. S.; Branz, H. M.

    2000-01-01

    Efficient hydrogenated amorphous silicon (a-Si:H) nip solar cells have been fabricated with all doped and undoped a-Si:H layers deposited by hot-wire chemical vapor deposition (HWCVD). The total deposition time of all layers, except the top ITO-contact, is less than 4 minutes.

  11. A kinetic and equilibrium analysis of silicon carbide chemical vapor deposition on monofilaments

    NASA Technical Reports Server (NTRS)

    Gokoglu, S. A.; Kuczmarski, M. A.

    1993-01-01

    Chemical kinetics of atmospheric pressure silicon carbide (SiC) chemical vapor deposition (CVD) from dilute silane and propane source gases in hydrogen is numerically analyzed in a cylindrical upflow reactor designed for CVD on monofilaments. The chemical composition of the SiC deposit is assessed both from the calculated total fluxes of carbon and silicon and from chemical equilibrium considerations for the prevailing temperatures and species concentrations at and along the filament surface. The effects of gas and surface chemistry on the evolution of major gas phase species are considered in the analysis.

  12. Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition.

    PubMed

    Vasudev, Milana C; Koerner, Hilmar; Singh, Kristi M; Partlow, Benjamin P; Kaplan, David L; Gazit, Ehud; Bunning, Timothy J; Naik, Rajesh R

    2014-02-10

    In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited d-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process. PMID:24400716

  13. Chemical vapor deposition and characterization of titanium dioxide thin films

    NASA Astrophysics Data System (ADS)

    Gilmer, David Christopher

    1998-12-01

    The continued drive to decrease the size and increase the speed of micro-electronic Metal-Oxide-Semiconductor (MOS) devices is hampered by some of the properties of the SiOsb2 gate dielectric. This research has focused on the CVD of TiOsb2 thin films to replace SiOsb2 as the gate dielectric in MOS capacitors and transistors. The relationship of CVD parameters and post-deposition anneal treatments to the physical and electrical properties of thin films of TiOsb2 has been studied. Structural and electrical characterization of TiOsb2 films grown from the CVD precursors tetraisopropoxotitanium (IV) (TTIP) and TTIP plus Hsb2O is described in Chapter 3. Both types of deposition produced stoichiometric TiOsb2 films comprised of polycrystalline anatase, but the interface properties were dramatically degraded when water vapor was added. Films grown with TTIP in the presence of Hsb2O contained greater than 50% more hydrogen than films grown using only TTIP and the hydrogen content of films deposited in both wet and dry TTIP environments decreased sharply with a post deposition Osb2 anneal. A significant thickness variation of the dielectric constant was observed which could be explained by an interfacial oxide and the finite accumulation thickness. Fabricated TiOsb2 capacitors exhibited electrically equivalent SiOsb2 gate dielectric thicknesses and leakage current densities as low as 38, and 1×10sp{-8} Amp/cmsp2 respectively. Chapter 4 discusses the low temperature CVD of crystalline TiOsb2 thin films deposited using the precursor tetranitratotitanium (IV), TNT, which produces crystalline TiOsb2 films of the anatase phase in UHV-CVD at temperatures as low as 184sp°C. Fabricated TiOsb2 capacitors exhibited electrically equivalent SiOsb2 gate dielectric thicknesses and leakage current densities as low as 17, and 1×10sp{-8} Amp/cmsp2 respectively. Chapter 5 describes the results of a comparison of physical and electrical properties between TiOsb2 films grown via LPCVD using

  14. A tunable MWIR laser remote sensor for chemical vapor detection

    NASA Astrophysics Data System (ADS)

    Bunn, Thomas L.; Noblett, Patricia M.; Otting, William D.

    1998-01-01

    The Air Force vision for Global Virtual Presence suggests a need for active remote sensing systems that provide both global coverage and the ability to detect multiple gaseous chemical species at low concentration from a significant standoff distance. The system will need to have acceptable weight, volume, and power characteristics, as well as a long operating lifetime for integration with various surveillance platforms. Laser based remote sensing systems utilizing the differential absorption lidar (DIAL) technique are promising for long range chemical sensing applications. Recent advancements in pulsed, diode pumped solid state laser (DPSSL) technology and in tunable optical parametric oscillators (OPO) make broadly tunable laser transmitters possible for the DIAL system. Also the characteristic narrow spectral bandwidth of these laser devices provides high measurement sensitivity and spectral selectivity with the potential to avoid interfering species. Rocketdyne has built and tested a tunable, midwave infrared (MWIR) DIAL system using DPSSL/OPO technology. The key to the system is a novel tuning and line narrowing technology developed for the OPO. The tuning system can quickly adjust to the desired wavelength and precisely locate a narrow spectral feature of interest. Once the spectral feature is located, a rapid dither tuning technique is employed. The laser pulses are tuned ``on'' and ``off'' the spectral resonance of a molecule with precise and repeatable performance as required to make the DIAL measurement. To date, the breadboard system has been tested by measuring methane, ethane, and sulfur dioxide in a calibrated gas cell at a range of 60 meters.

  15. Oxidation of Chemically-Vapor-Deposited Silicon Carbide in Carbon Dioxide

    NASA Technical Reports Server (NTRS)

    Opila, Elizabeth J.; Nguyen, QuynhGiao N.

    1998-01-01

    Chemically-vapor-deposited silicon carbide (CVD SiC) was oxidized in carbon dioxide (CO2) at temperatures of 1200-1400 C for times between 96 and 500 h at several gas flow rates. Oxidation weight gains were monitored by thermogravimetric analysis (TGA) and were found to be very small and independent of temperature. Possible rate limiting kinetic mechanisms are discussed. Passive oxidation of SiC by CO2 is negligible compared to the rates measured for other oxidants that are also found in combustion environments, oxygen and water vapor.

  16. Stack growth of aligned multiwalled carbon nanotubes using floating catalyst chemical vapor deposition technique

    NASA Astrophysics Data System (ADS)

    Saheed, Mohamed Shuaib Mohamed; Mohamed, Norani Muti

    2015-04-01

    The Letter reports another approach to grow vertically aligned millimeter length multiwalled carbon nanotubes (MWCNT) using chemical vapor deposition technique. In this stack growth, the first grown MWCNT layer is observe to have been lift-off from the substrate surface by the newly grown underneath layer as a result of the diffusion of iron catalyst and carbon source through the first layer. The first grown layer acts as a permeable membrane allowing the catalyst vapor and carbon to reach the bottom layer and the top surface of the substrate, resulting in the growth of another layer of MWCNT underneath it.

  17. Relationship between the evaporation rate and vapor pressure of moderately and highly volatile chemicals.

    PubMed

    van Wesenbeeck, Ian; Driver, Jeffrey; Ross, John

    2008-04-01

    Volatilization of chemicals can be an important form of dissipation in the environment. Rates of evaporative losses from plant and soil surfaces are useful for estimating the potential for food-related dietary residues and operator and bystander exposure, and can be used as source functions for screening models that predict off-site movement of volatile materials. A regression of evaporation on vapor pressure from three datasets containing 82 pesticidal active ingredients and co-formulants, ranging in vapor pressure from 0.0001 to >30,000 Pa was developed for this purpose with a regression correlation coefficient of 0.98. PMID:18344074

  18. Alcohol vapor sensing by cadmium-doped zinc oxide thick films based chemical sensor

    NASA Astrophysics Data System (ADS)

    Zargar, R. A.; Arora, M.; Chackrabarti, S.; Ahmad, S.; Kumar, J.; Hafiz, A. K.

    2016-04-01

    Cadmium-doped zinc oxide nanoparticles were derived by simple chemical co-precipitation route using zinc acetate dihydrate and cadmium acetate dihydrate as precursor materials. The thick films were casted from chemical co-precipitation route prepared nanoparticles by economic facile screen printing method. The structural, morphological, optical and electrical properties of the film were characterized relevant to alcohol vapor sensing application by powder XRD, SEM, UV-VIS and DC conductivity techniques. The response and sensitivity of alcohol (ethanol) vapor sensor are obtained from the recovery curves at optimum working temperature range from 20∘C to 50∘C. The result shows that maximum sensitivity of the sensor is observed at 25∘C operating temperature. On varying alcohol vapor concentration, minor variation in resistance has been observed. The sensing mechanism of sensor has been described in terms of physical adsorption and chemical absorption of alcohol vapors on cadmium-doped zinc oxide film surface and inside film lattice network through weak hydrogen bonding, respectively.

  19. Chemical vapor deposition of atomically thin materials for membrane dialysis applications

    NASA Astrophysics Data System (ADS)

    Kidambi, Piran; Mok, Alexander; Jang, Doojoon; Boutilier, Michael; Wang, Luda; Karnik, Rohit; Microfluidics; Nanofluidics Research Lab Team

    2015-11-01

    Atomically thin 2D materials like graphene and h-BN represent a new class of membranes materials. They offer the possibility of minimum theoretical membrane transport resistance along with the opportunity to tune pore sizes at the nanometer scale. Chemical vapor deposition has emerged as the preferable route towards scalable, cost effective synthesis of 2D materials. Here we show selective molecular transport through sub-nanometer diameter pores in graphene grown via chemical vapor deposition processes. A combination of pressure driven and diffusive transport measurements shows evidence for size selective transport behavior which can be used for separation by dialysis for applications such as desalting of biomolecular or chemical solutions. Principal Investigator

  20. Effects of growth pressure on morphology of ZnO nanostructures by chemical vapor transport

    NASA Astrophysics Data System (ADS)

    Babu, Eadi Sunil; Kim, Sungjin; Song, Jung-Hoon; Hong, Soon-Ku

    2016-08-01

    The effect of growth pressure on the morphology of the ZnO nanostructures in chemical vapor transport by using Zn powder and oxygen as source materials has been investigated. Highly uniform aligned ZnO nanorods or multifaceted tripod structures were grown depending on the growth pressure. The mechanism governing the morphology change was explained by the relative concentration of Zn vapor and supersaturation based on experimental observations. It was concluded that heterogeneous nucleation on the substrate is enhanced at low growth pressure, while homogeneous nucleation from vapor phase is enhanced at high growth pressure. The difference resulted in different morphology of ZnO nanostructures. ZnO nanorods grown at optimized condition were used for the fabrication of gas sensor for the detection of H2 gas.

  1. Oxidation Kinetics of Chemically Vapor-Deposited Silicon Carbide in Wet Oxygen

    NASA Technical Reports Server (NTRS)

    Opila, Elizabeth J.

    1994-01-01

    The oxidation kinetics of chemically vapor-deposited SiC in dry oxygen and wet oxygen (P(sub H2O) = 0.1 atm) at temperatures between 1200 C and 1400 C were monitored using thermogravimetric analysis. It was found that in a clean environment, 10% water vapor enhanced the oxidation kinetics of SiC only very slightly compared to rates found in dry oxygen. Oxidation kinetics were examined in terms of the Deal and Grove model for oxidation of silicon. It was found that in an environment containing even small amounts of impurities, such as high-purity Al2O3 reaction tubes containing 200 ppm Na, water vapor enhanced the transport of these impurities to the oxidation sample. Oxidation rates increased under these conditions presumably because of the formation of less protective sodium alumino-silicate scales.

  2. Diagnostic for Plasma Enhanced Chemical Vapor Deposition and Etch Systems

    NASA Technical Reports Server (NTRS)

    Cappelli, Mark A.

    1999-01-01

    In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies ion the processing of semiconductor materials arising from understanding etch chemistries are being developed through a research collaboration between Stanford University and NASA-Ames Research Center, Although a great deal of laboratory-scale research has been performed on many of materials processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. In addition, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. The research described involves the study of plasmas used in semiconductor processes. An inductively coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics and chemistries. This ICP source generates plasmas with higher electron densities (approximately 10(exp 12)/cu cm) and lower operating pressures (approximately 7 mTorr) than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The motivation for this study is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas-phase and surface reaction rates. species

  3. Hydrological, chemical, and isotopic budgets of Lake Chad: a quantitative assessment of evaporation, transpiration and infiltration fluxes

    NASA Astrophysics Data System (ADS)

    Bouchez, Camille; Goncalves, Julio; Deschamps, Pierre; Vallet-Coulomb, Christine; Hamelin, Bruno; Doumnang, Jean-Claude; Sylvestre, Florence

    2016-04-01

    In the Sahelian belt, Lake Chad is a key water body for 13 million people, who live on its resources. It experiences, however, substantial and frequent surface changes. Located at the centre of one of the largest endorheic basins in the world, its waters remain surprisingly fresh. Its low salinity has been attributed to a low infiltration flow whose value remains poorly constrained. Understanding the lake's hydrological behaviour in response to climate variability requires a better constraint of the factors that control its water and chemical balance. Based on the three-pool conceptualization of Lake Chad proposed by Bader et al. (2011), this study aims to quantify the total water outflow from the lake, the respective proportions of evaporation (E), transpiration (T), and infiltration (I), and the associated uncertainties. A Bayesian inversion method based on lake-level data was used, leading to total water loss estimates in each pool (E + T + I = ETI). Sodium and stable isotope mass balances were then used to separate total water losses into E, T, and I components. Despite the scarcity of representative data available on the lake, the combination of these two geochemical tracers is relevant to assess the relative contribution of these three outflows involved in the control of the hydrological budget. Mean evapotranspiration rates were estimated at 2070 ± 100 and 2270 ± 100 mm yr-1 for the southern and northern pools, respectively. Infiltration represents between 100 and 300 mm yr-1 but most of the water is evapotranspirated in the first few kilometres from the shorelines and does not efficiently recharge the Quaternary aquifer. Transpiration is shown to be significant, around 300 mm yr-1 and reaches 500 mm yr-1 in the vegetated zone of the archipelagos. Hydrological and chemical simulations reproduce the marked hydrological change between the normal lake state that occurred before 1972 and the small lake state after 1972 when the lake surface shrunk to a one

  4. Hydrological, chemical and isotopic budgets of Lake Chad: a quantitative assessment of evaporation, transpiration and infiltration fluxes

    NASA Astrophysics Data System (ADS)

    Bouchez, C.; Goncalves, J.; Deschamps, P.; Vallet-Coulomb, C.; Hamelin, B.; Doumnang, J.-C.; Sylvestre, F.

    2015-10-01

    In the Sahelian belt, Lake Chad is a key water body for 13 million people who live on its resources. It experiences, however, substantial and frequent surface changes. Located at the center of one of the largest endorheic basins in the world, its waters remain surprisingly fresh. Its low salinity has been attributed to a low infiltration flow whose value remains poorly constrained. Understanding the lake's hydrological behavior in response to climate variability requires a better constraint of the factors that control its water and chemical balance. Based on the three-pool conceptualization of Lake Chad proposed by J. C. Bader, J. Lemoalle, and M. Leblanc (Bader et al., 2011), this study aims to quantify the total water outflow from the lake, the respective proportions of evaporation (E), transpiration (T) and infiltration (I), and the associated uncertainties. A Bayesian inversion method based on lake-level data was used, leading to total water loss estimates in each pool (ETI). Sodium and stable isotope mass balances were then used to separate total water losses into E, T and I components. Despite the scarcity of representative data available on the lake, the combination of these two geochemical tracers is relevant to assess the relative contribution of these three outflows involved in the control of the hydrological budget. Mean evapotranspiration rates were estimated at 2070 ± 100 and 2270 ± 100 mm yr-1 for the southern and northern pools respectively. Infiltration represents between 100 and 300 mm yr-1 but most of the water is evapotranspirated in the first few kilometers from the shorelines and does not efficiently recharge the Quaternary aquifer. Transpiration is shown to be significant, around 300 mm yr-1 and reaches 500 mm yr-1 in the vegetated zone of the archipelagos. Hydrological and chemical simulations reproduce the marked hydrological change between the normal lake state that occurred before 1972 and the small lake state after 1972 when the lake

  5. Mechanical and piezoresistive properties of thin silicon films deposited by plasma-enhanced chemical vapor deposition and hot-wire chemical vapor deposition at low substrate temperatures

    NASA Astrophysics Data System (ADS)

    Gaspar, J.; Gualdino, A.; Lemke, B.; Paul, O.; Chu, V.; Conde, J. P.

    2012-07-01

    This paper reports on the mechanical and piezoresistance characterization of hydrogenated amorphous and nanocrystalline silicon thin films deposited by hot-wire chemical vapor deposition (HWCVD) and radio-frequency plasma-enhanced chemical vapor deposition (PECVD) using substrate temperatures between 100 and 250 °C. The microtensile technique is used to determine film properties such as Young's modulus, fracture strength and Weibull parameters, and linear and quadratic piezoresistance coefficients obtained at large applied stresses. The 95%-confidence interval for the elastic constant of the films characterized, 85.9 ± 0.3 GPa, does not depend significantly on the deposition method or on film structure. In contrast, mean fracture strength values range between 256 ± 8 MPa and 600 ± 32 MPa: nanocrystalline layers are slightly stronger than their amorphous counterparts and a pronounced increase in strength is observed for films deposited using HWCVD when compared to those grown by PECVD. Extracted Weibull moduli are below 10. In terms of piezoresistance, n-doped radio-frequency nanocrystalline silicon films deposited at 250 °C present longitudinal piezoresistive coefficients as large as -(2.57 ± 0.03) × 10-10 Pa-1 with marginally nonlinear response. Such values approach those of crystalline silicon and of polysilicon layers deposited at much higher temperatures.

  6. Chemical vapor synthesis of nanocrystalline perovskites using laser flash evaporation of low volatility solid precursors

    NASA Astrophysics Data System (ADS)

    Winterer, Markus; Srdic, Vladimir V.; Djenadic, Ruzica; Kompch, Alexander; Weirich, Thomas E.

    2007-12-01

    One key requirement for the production of multinary oxide films by chemical vapor deposition (CVD) or nanocrystalline multinary oxides particles by chemical vapor synthesis (CVS) is the availability of precursors with high vapor pressure. This is especially the case for CVS where much higher production rates are required compared to thin films prepared by CVD. However, elements, which form low valent cations such as alkaline earth metals, are typically only available as solid precursors of low volatility, e.g., in form of β-diketonates. This study describes laser flash evaporation as precursor delivery method for CVS of nanocrystalline perovskites. Laser flash evaporation exploits the nonequilibrium evaporation of solid metal organic precursors of low vapor pressure by absorption of the infrared radiation of a CO2 laser. It is shown that stoichiometric, nanocrystalline particles consisting of SrZrO3 and SrTiO3 can be formed from corresponding mixtures of β-diketonates which are evaporated nonselectively and with high rates by laser flash evaporation.

  7. Chemical vapor synthesis of nanocrystalline perovskites using laser flash evaporation of low volatility solid precursors.

    PubMed

    Winterer, Markus; Srdic, Vladimir V; Djenadic, Ruzica; Kompch, Alexander; Weirich, Thomas E

    2007-12-01

    One key requirement for the production of multinary oxide films by chemical vapor deposition (CVD) or nanocrystalline multinary oxides particles by chemical vapor synthesis (CVS) is the availability of precursors with high vapor pressure. This is especially the case for CVS where much higher production rates are required compared to thin films prepared by CVD. However, elements, which form low valent cations such as alkaline earth metals, are typically only available as solid precursors of low volatility, e.g., in form of beta-diketonates. This study describes laser flash evaporation as precursor delivery method for CVS of nanocrystalline perovskites. Laser flash evaporation exploits the nonequilibrium evaporation of solid metal organic precursors of low vapor pressure by absorption of the infrared radiation of a CO(2) laser. It is shown that stoichiometric, nanocrystalline particles consisting of SrZrO(3) and SrTiO(3) can be formed from corresponding mixtures of beta-diketonates which are evaporated nonselectively and with high rates by laser flash evaporation. PMID:18163736

  8. Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition

    DOEpatents

    Lackey, Jr., Walter J.; Caputo, Anthony J.

    1986-01-01

    A chemical vapor deposition (CVD) process for preparing fiber-reinforced ceramic composites. A specially designed apparatus provides a steep thermal gradient across the thickness of a fibrous preform. A flow of gaseous ceramic matrix material is directed into the fibrous preform at the cold surface. The deposition of the matrix occurs progressively from the hot surface of the fibrous preform toward the cold surface. Such deposition prevents the surface of the fibrous preform from becoming plugged. As a result thereof, the flow of reactant matrix gases into the uninfiltrated (undeposited) portion of the fibrous preform occurs throughout the deposition process. The progressive and continuous deposition of ceramic matrix within the fibrous preform provides for a significant reduction in process time over known chemical vapor deposition processes.

  9. Development of Single Crystal Chemical Vapor Deposition Diamonds for Detector Applications

    SciTech Connect

    Harris Kagan; K.K. Gan; Richard Kass

    2009-03-31

    Diamond was studied as a possible radiation hard technology for use in future high radiation environments. With the commissioning of the LHC expected in 2009, and the LHC upgrades expected in 2013, all LHC experiments are planning for detector upgrades which require radiation hard technologies. Chemical Vapor Deposition (CVD) diamond has now been used extensively in beam conditions monitors as the innermost detectors in the highest radiation areas of BaBar, Belle and CDF and is installed in all LHC experiments. As a result, this material is now being discussed as an alternative sensor material for tracking very close to the interaction region of the super-LHC where the most extreme radiation conditions will exist. Our work addressed the further development of the new material, single-crystal Chemical Vapor Deposition diamond, towards reliable industrial production of large pieces and new geometries needed for detector applications.

  10. Development of Single Crystal Chemical Vapor Deposition Diamonds for Detector Applications

    SciTech Connect

    Rainer Wallny

    2012-10-15

    Diamond was studied as a possible radiation hard technology for use in future high radiation environments. With the commissioning of the LHC expected in 2010, and the LHC upgrades expected in 2015, all LHC experiments are planning for detector upgrades which require radiation hard technologies. Chemical Vapor Deposition (CVD) diamond has now been used extensively in beam conditions monitors as the innermost detectors in the highest radiation areas of BaBar, Belle and CDF and is installed and operational in all LHC experiments. As a result, this material is now being discussed as an alternative sensor material for tracking very close to the interaction region of the super-LHC where the most extreme radiation conditions will exist. Our work addressed the further development of the new material, single-crystal Chemical Vapor Deposition diamond, towards reliable industrial production of large pieces and new geometries needed for detector applications.

  11. Detection and characterization of chemical vapor fugitive emissions by nonlinear optimal estimation: theory and simulation.

    PubMed

    Gittins, Christopher M

    2009-08-10

    This paper addresses detection and characterization of chemical vapor fugitive emissions in a nonscattering atmosphere by processing of remotely-sensed long-wavelength infrared spectra. The analysis approach integrates a parameterized signal model based on the radiative transfer equation with a statistical model for the infrared background. The maximum likelihood model parameter values are defined as those that maximize a Bayesian posterior probability and are estimated using a Gauss-Newton algorithm. For algorithm performance evaluation we simulate observation of fugitive emissions by augmenting plume-free measured spectra with synthetic plume signatures. As plumes become optically thick, the Gauss-Newton algorithm yields significantly more accurate estimates of chemical vapor column density and significantly more favorable plume detection statistics than clutter-matched-filter-based and adaptive-subspace-detector-based plume characterization and detection. PMID:19668269

  12. Chemically enhanced mixed region vapor stripping of TCE-contaminated saturated peat and silty clay soils

    SciTech Connect

    West, O.R.; Cameron, P.A.; Lucero, A.J.; Koran, L.J. Jr.

    1996-01-01

    The objective of this study was to conduct further testing of MRVS, chemically enhanced with calcium oxide conditioning, on field- contaminated soils collected from beneath the NASA Michoud Rinsewater Impoundment. In this study, residual soil VOC levels as a function of vapor stripping time were measured to quantify VOC removal rates. Physical and chemical soil parameters expected to affect MRVS efficiency were measures. The effects of varying the calcium oxide loadings as well as varying the vapor stripping flow rates on VOC removal were also evaluated. The results of this study will be used to determine whether acceptable removals can be achieved within reasonable treatment times, remediation costs being directly proportional to the latter. The purpose of this report is to document the experimental results of this study, as well as to address issues that were raised after completion of the previous Michoud treatability work.

  13. Thin Films of Gallium Arsenide and Gallium Aluminum Arsenide by Metalorganic Chemical Vapor Deposition.

    NASA Astrophysics Data System (ADS)

    Look, Edward Gene Lun

    Low pressure metalorganic chemical vapor deposition (LPMOCVD) of thin films of gallium arsenide (GaAs) and gallium aluminum arsenide (GaAlAs) was performed in a horizontal cold wall chemical vapor deposition (CVD) reactor. The organometallic (group III) sources were triethylgallium (TEGa) and triethylaluminum (TEAl), used in conjunction with arsine (AsH_3) as the group V source. It was found that growth parameters such as growth temperature, pressure, source flow rates and temperatures have a profound effect on the film quality and composition. Depending on the particular combination of conditions, both the surface and overall morphologies may be affected. The films were nondestructively analyzed by Raman and photoreflectance spectroscopies, x-ray diffraction and rocking curve studies, scanning electron microscopy, energy dispersive spectroscopy, Hall measurements and film thicknesses were determined with a step profilometer.

  14. Investigations of chemical vapor deposition of GaN using synchrotron radiation

    SciTech Connect

    Thompson, C.; Stephenson, G. B.; Eastman, J. A.; Munkholm, A.; Auciello, O.; Murty, M. V. R.; Fini, P.; DenBaars, S. P.; Speck, J. S.

    2000-05-25

    The authors apply synchrotron x-ray analysis techniques to probe the surface structure of GaN films during synthesis by metal-organic chemical vapor deposition (MOCVD). Their approach is to observe the evolution of surface structure and morphology in real time using grazing incidence x-ray scattering (GIXS). This technique combines the ability of x-rays to penetrate the chemical vapor deposition environment for in situ measurements, with the sensitivity of GIXS to atomic scale structure. In this paper they present examples from some of their studies of growth modes and surface evolution as a function of process conditions that illustrate the capabilities of synchrotron x-ray analysis during MOCVD growth. They focus on studies of the homoepitaxial growth mode, island coarsening dynamics, and effects of impurities.

  15. Proposed Occupational Exposure Limits for Non-Carcinogenic Hanford Waste Tank Vapor Chemicals

    SciTech Connect

    Poet, Torka S.; Timchalk, Chuck

    2006-03-24

    A large number of volatile chemicals have been identified in the headspaces of tanks used to store mixed chemical and radioactive waste at the U.S. Department of Energy (DOE) Hanford Site, and there is concern that vapor releases from the tanks may be hazardous to workers. Contractually established occupational exposure limits (OELs) established by the Occupational Safety and Health Administration (OSHA) and American Conference of Governmental Industrial Hygienists (ACGIH) do not exist for all chemicals of interest. To address the need for worker exposure guidelines for those chemicals that lack OSHA or ACGIH OELs, a procedure for assigning Acceptable Occupational Exposure Limits (AOELs) for Hanford Site tank farm workers has been developed and applied to a selected group of 57 headspace chemicals.

  16. Electrochromic properties of molybdenum trioxide thin films prepared by chemical vapor deposition

    SciTech Connect

    Maruyama, Toshiro; Kanagawa, Tetsuya

    1995-05-01

    Electrochromic molybdenum trioxide thin films were prepared by chemical vapor deposition. The source material was molybdenum carbonyl. Amorphous molybdenum trioxide thin films were produced at a substrate temperature 300 C. Reduction and oxidation of the films in a 0.3M LiClO{sub 4} propylene carbonate solution caused desirable changes in optical absorption. Coulometry indicated that the coloration efficiency was 25.8 cm{sup 2}/C.

  17. InAs/GaSb superlattices fabricated by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Levin, R. V.; Nevedomskii, V. N.; Pushnyi, B. V.; Bert, N. A.; Mizerov, M. N.

    2016-01-01

    The possibility of fabricating InAs/GaSb strained-layer superlattices by metalorganic chemical vapor deposition has been experimentally demonstrated. The results of transmission electron microscopy and photoluminescence spectroscopy investigations showed that the obtained structures comprise an InAs?GaSb superlattice on a GaSb substrate consisting of 2-nm-thick InAs and 3.3-nm-thick GaSb layers.

  18. Chemical Vapor Deposition of Large-Sized Hexagonal WSe₂ Crystals on Dielectric Substrates.

    PubMed

    Chen, Jianyi; Liu, Bo; Liu, Yanpeng; Tang, Wei; Nai, Chang Tai; Li, Linjun; Zheng, Jian; Gao, Libo; Zheng, Yi; Shin, Hyun Suk; Jeong, Hu Young; Loh, Kian Ping

    2015-11-01

    High-quality large-sized hexagoal WSe2 crystals can be grown on dielectric substrates using atmospheric chemical vapor deposition in the presence of hydrogen gas. These hexagonal crystals (lateral width >160 um) have a carrier mobility of 100 cm(2) V(-1) s(-1) and a photoresponsivity of ≈1100 mA W(-1), which is comparable to that of exfoliated flakes. PMID:26414106

  19. Metal-oxide-semiconductor characteristics of chemical vapor deposited cubic-SiC

    NASA Astrophysics Data System (ADS)

    Shibahara, K.; Nishino, S.; Matsunami, H.

    1984-11-01

    Thermal oxidation of chemical vapor deposited (CVD) cubic-SiC and fabrication of MOS diodes using a thermal oxide film were carried out. The thermal oxide was found to be SiO2 by Auger electron spectroscopic analysis. Capacitance-voltage curves of MOS diodes measured under the dark condition showed deep depletion characteristics. Inversion characteristics were observed under the illuminated condition for the first time.

  20. Synthesis of boron-doped graphene monolayers using the sole solid feedstock by chemical vapor deposition.

    PubMed

    Wang, Huan; Zhou, Yu; Wu, Di; Liao, Lei; Zhao, Shuli; Peng, Hailin; Liu, Zhongfan

    2013-04-22

    Substitutionally boron-doped monolayer graphene film is grown on a large scale by using a sole phenylboronic acid as the source in a low-pressure chemical vapor deposition system. The B-doped graphene film is a homogeneous monolayer with high crystalline quality, which exhibits a stable p-type doping behavior with a considerably high room-temperature carrier mobility of about 800 cm(2) V(-1) s(-1) . PMID:23463717

  1. Fabrication of lightweight ceramic mirrors by means of a chemical vapor deposition process

    NASA Technical Reports Server (NTRS)

    Goela, Jitendra S. (Inventor); Taylor, Raymond L. (Inventor)

    1991-01-01

    A process to fabricate lightweigth ceramic mirrors, and in particular, silicon/silicon carbide mirrors, involves three chemical vapor deposition steps: one to produce the mirror faceplate, the second to form the lightweight backstructure which is deposited integral to the faceplate, and the third and final step which results in the deposition of a layer of optical grade material, for example, silicon, onto the front surface of the faceplate. The mirror figure and finish are fabricated into this latter material.

  2. GaN Stress Evolution During Metal-Organic Chemical Vapor Deposition

    SciTech Connect

    Amano, H.; Chason, E.; Figiel, J.; Floro, J.A.; Han, J.; Hearne, S.; Hunter, J.; Tsong, I.

    1998-10-14

    The evolution of stress in gallium nitride films on sapphire has been measured in real- time during metal organic chemical vapor deposition. In spite of the 161%0 compressive lattice mismatch of GaN to sapphire, we find that GaN consistently grows in tension at 1050"C. Furthermore, in-situ stress monitoring indicates that there is no measurable relaxation of the tensile growth stress during annealing or thermal cycling.

  3. High index of refraction films for dielectric mirrors prepared by metal-organic chemical vapor deposition

    SciTech Connect

    Brusasco, R.M.

    1989-01-01

    A wide variety of metal oxides with high index of refraction can be prepared by Metal-Organic Chemical Vapor Deposition. We present some recent optical and laser damage results on oxide films prepared by MOCVD which could be used in a multilayer structure for highly reflecting (HR) dielectric mirror applications. The method of preparation affects both optical properties and laser damage threshold. 10 refs., 8 figs., 4 tabs.

  4. Low temperature growth of vertically aligned carbon nanotubes by thermal chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Lee, Cheol Jin; Son, Kwon Hee; Park, Jeunghee; Yoo, Jae Eun; Huh, Yoon; Lee, Jeong Yong

    2001-04-01

    Vertically well-aligned carbon nanotubes (CNTs) are grown on Fe-deposited silicon oxide substrate at 550°C by thermal chemical vapor deposition of C 2H 2 gas. We employed two-stage heating technique that the reactants heated at 850°C in the first zone flow into the second zone maintained at 550°C for CNT growth. The CNTs have bamboo structure, closed tip, and defective graphite sheets.

  5. Growth model of bamboo-shaped carbon nanotubes by thermal chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Lee, Cheol Jin; Park, Jeunghee

    2000-11-01

    Vertically aligned carbon nanotubes were grown on iron-deposited silicon oxide substrate by thermal chemical vapor deposition of acetylene. The carbon nanotubes have no encapsulated iron particles at the closed tip and a bamboo structure in which the curvature of compartment layers is directed to the tip. A base growth model is suggested for the bamboo-shaped carbon nanotubes grown under our experimental conditions.

  6. Metal organic chemical vapor deposition of 111-v compounds on silicon

    DOEpatents

    Vernon, Stanley M.

    1986-01-01

    Expitaxial composite comprising thin films of a Group III-V compound semiconductor such as gallium arsenide (GaAs) or gallium aluminum arsenide (GaAlAs) on single crystal silicon substrates are disclosed. Also disclosed is a process for manufacturing, by chemical deposition from the vapor phase, epitaxial composites as above described, and to semiconductor devices based on such epitaxial composites. The composites have particular utility for use in making light sensitive solid state solar cells.

  7. Monolayer Graphene Growth on Ni(111) by Low Temperature Chemical Vapor Deposition

    SciTech Connect

    Batzill, M.; Sutter, P.; Addou, R.; Dahal, A.

    2012-01-09

    In contrast to the commonly employed high temperature chemical vapor deposition growth that leads to multilayer graphene formation by carbon segregation from the bulk, we demonstrate that below 600 C graphene can be grown in a self-limiting monolayer growth process. Optimum growth is achieved at {approx}550 C. Above this temperature, carbon diffusion into the bulk is limiting the surface growth rate, while at temperatures below {approx}500 C a competing surface carbide phase impedes graphene formation.

  8. Synthesis of Cobalt Oxides Thin Films Fractal Structures by Laser Chemical Vapor Deposition

    PubMed Central

    Haniam, P.; Kunsombat, C.; Chiangga, S.; Songsasen, A.

    2014-01-01

    Thin films of cobalt oxides (CoO and Co3O4) fractal structures have been synthesized by using laser chemical vapor deposition at room temperature and atmospheric pressure. Various factors which affect the density and crystallization of cobalt oxides fractal shapes have been examined. We show that the fractal structures can be described by diffusion-limited aggregation model and discuss a new possibility to control the fractal structures. PMID:24672354

  9. Synthesis of cobalt oxides thin films fractal structures by laser chemical vapor deposition.

    PubMed

    Haniam, P; Kunsombat, C; Chiangga, S; Songsasen, A

    2014-01-01

    Thin films of cobalt oxides (CoO and Co3O4) fractal structures have been synthesized by using laser chemical vapor deposition at room temperature and atmospheric pressure. Various factors which affect the density and crystallization of cobalt oxides fractal shapes have been examined. We show that the fractal structures can be described by diffusion-limited aggregation model and discuss a new possibility to control the fractal structures. PMID:24672354

  10. The development of chemically vapor deposited mullite coatings for the corrosion protection of SiC

    SciTech Connect

    Auger, M.; Hou, P.; Sengupta, A.; Basu, S.; Sarin, V.

    1998-05-01

    Crystalline mullite coatings have been chemically vapor deposited onto SiC substrates to enhance the corrosion and oxidation resistance of the substrate. Current research has been divided into three distinct areas: (1) Development of the deposition processing conditions for increased control over coating`s growth rate, microstructure, and morphology; (2) Analysis of the coating`s crystal structure and stability; (3) The corrosion resistance of the CVD mullite coating on SiC.

  11. A new doping method using metalorganics in chemical vapor deposition of 6H-SiC

    NASA Astrophysics Data System (ADS)

    Yoshida, S.; Sakuma, E.; Misawa, S.; Gonda, S.

    1984-01-01

    Aluminum doping was performed using triethylaluminum as the dopant in chemical vapor deposition of 6H-silicon carbide (SiC). Measurements on the electrical and cathodoluminescent properties of the epilayers indicate that the doping concentration of aluminum can be easily controlled by the flow rate of metalorganics. Electroluminescence was also observed for the pn junctions prepared by the successive growth of a nondoped n layer and a p layer doped with aluminum using metalorganics.

  12. Negative Electron Affinity Effect on the Surface of Chemical Vapor Deposited Diamond Polycrystalline Films

    NASA Technical Reports Server (NTRS)

    Krainsky, I. L.; Asnin, V. M.; Mearini, G. T.; Dayton, J. A., Jr.

    1996-01-01

    Strong negative electron affinity effects have been observed on the surface of as-grown chemical vapor deposited diamond using Secondary Electron Emission. The test samples were randomly oriented and the surface was terminated with hydrogen. The effect appears as an intensive peak in the low energy part of the spectrum of the electron energy distribution and may be described in the model of effective negative electron affinity.

  13. Microstructure of boron nitride coated on nuclear fuels by plasma enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Durmazuçar, Hasan H.; Gündüz, Güngör; Toker, Canan

    1998-08-01

    Three nuclear fuels, pure urania, 5% and 10% gadolinia containing fuels were coated with boron nitride to improve nuclear and physical properties. Coating was done by plasma enhanced chemical vapor deposition technique by using boron trichloride and ammonia. The specimens were examined under a scanning electron microscope. Boron nitride formed a grainy structure on all fuels. Gadolinia decreased the grain size of boron nitride. The fractal dimensions of fragmentation and of area-perimeter relation were determined.

  14. Conductivity of Thin Films Based on Single-Walled Carbon Nanotubes Grown by Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Rybakov, M. S.; Kosobutsky, A. V.; Sevostyanov, O. G.; Russakov, D. M.; Lomakin, M. V.; Chirkova, I. M.; Shandakov, S. D.

    2015-03-01

    Electrical and optical properties of thin films of single-walled carbon nanotubes (SWCNT) obtained by aerosol chemical vapor deposition using ethanol, ferrocene, and sulfur are studied. Structural and geometrical characteristics of the synthesis products are determined by the methods of Raman spectroscopy and transmission electron microscopy. The effect of sulfur on the properties of the SWCNTs and thin films based on them is found.

  15. Gravity Effects in Carbon Nanotube Growth by Thermal Chemical Vapor Deposition

    NASA Technical Reports Server (NTRS)

    Zhu, S.; Su, C. H.; Cochrane, J. C.; Lehoczky, S. L.; Cui, Y.; Burger, A.; Whitaker, Ann F. (Technical Monitor)

    2001-01-01

    Carbon nanotubes are synthesized using thermal chemical vapor deposition. The sizes of these carbon nanotubes (CNT) are quite uniform and the length of the tube is up to several tens of micrometers. With the substrate surface normal either along or against the gravity vector, different growth orientations of CNT are observed by scanning electron microscopy although the Raman spectra are similar for samples synthesized at different locations. These results suggest the gravitation effects in the growth of long and small diameter CNT.

  16. Deposition of thermal and hot-wire chemical vapor deposition copper thin films on patterned substrates.

    PubMed

    Papadimitropoulos, G; Davazoglou, D

    2011-09-01

    In this work we study the hot-wire chemical vapor deposition (HWCVD) of copper films on blanket and patterned substrates at high filament temperatures. A vertical chemical vapor deposition reactor was used in which the chemical reactions were assisted by a tungsten filament heated at 650 degrees C. Hexafluoroacetylacetonate Cu(I) trimethylvinylsilane (CupraSelect) vapors were used, directly injected into the reactor with the aid of a liquid injection system using N2 as carrier gas. Copper thin films grown also by thermal and hot-wire CVD. The substrates used were oxidized silicon wafers on which trenches with dimensions of the order of 500 nm were formed and subsequently covered with LPCVD W. HWCVD copper thin films grown at filament temperature of 650 degrees C showed higher growth rates compared to the thermally ones. They also exhibited higher resistivities than thermal and HWCVD films grown at lower filament temperatures. Thermally grown Cu films have very uniform deposition leading to full coverage of the patterned substrates while the HWCVD films exhibited a tendency to vertical growth, thereby creating gaps and incomplete step coverage. PMID:22097561

  17. Chemical speciation in laser-desorption and impact-induced vapor in minerals

    NASA Astrophysics Data System (ADS)

    Shen, A. H.; Dundas, C. M.; Ahrens, T. J.; Beauchamp, J. L.

    2002-12-01

    Knowledge of the chemical species in vapors produced by hypervelocity impact on spacecraft impact detectors as well as planetary surfaces have applications ranging from determination of the composition of cosmic dust to the effects on atmospheres and climates of large impactors. Direct study of resulting atomic, molecular and ionic species is best accomplished via mass spectrometry. Pulsed laser desorption can be used to approximate small impacts on solid surfaces. We conducted pulsed laser desorption-ionization experiments using two different instruments: (1) a Caltech-built Time-of-Flight Mass Spectrometer (TOFMS) similar to that on board the Cassini spacecraft and (2) a commercial Matrix Assisted Laser Desorption Ionization TOFMS made by Applied Biosystems (Model, Voyager-DE Pro). Minerals included in this study were calcite, dolomite, gypsum, anhydrite, olivine, kamacite, brucite, serpentine, and pyrrhotite. We collected only positive ions. A nitrogen laser (337 nm wavelength, 4 μsec pulse width, and 300 mJ) with power density ranging from 1.0x107 to 1.3x109 W/cm2 induced vaporization and ionization. The results can be summarized as: (1) from kamacite and pyrrhotite, only 54Fe+, 56Fe+, 57Fe+ (both kamacite and pyrrhotite) and 58Ni+, 60Ni+ (kamacite only) as well as contamination ions such as 23Na+ and 39K+, 41K+were observed; (2) Ca-containing minerals (calcite, dolomite, gypsum and anhydrite) produced vapors containing 40Ca+ ions, and, at higher laser power, both 40Ca+ as well as CaO+ ions; (3) Mg-containing minerals (dolomite, olivine, brucite and serpentine) produced vapors containing MgO+ ion; (4) for all hydrous minerals, neither H+ nor H3O+ were observed in the vapor; (5) in the vapors of silicate minerals (olivine and serpentine), SiO+ was observed only from serpentine but not from olivine.

  18. Chemical vapor deposition of high T(sub c) superconducting films in a microgravity environment

    NASA Technical Reports Server (NTRS)

    Levy, Moises; Sarma, Bimal K.

    1994-01-01

    Since the discovery of the YBaCuO bulk materials in 1987, Metalorganic Chemical Vapor Deposition (MOCVD) has been proposed for preparing HTSC high T(sub c) films. This technique is now capable of producing high-T(sub c) superconducting thin films comparable in quality to those prepared by any other methods. The MOCVD technique has demonstrated its superior advantage in making large area high quality HTSC thin films and will play a major role in the advance of device applications of HTSC thin films. The organometallic precursors used in the MOCVD preparation of HTSC oxide thin films are most frequently metal beta-diketonates. High T(sub c) superconductors are multi-component oxides which require more than one component source, with each source, containing one kind of precursor. Because the volatility and stability of the precursors are strongly dependent on temperature, system pressure, and carrier gas flow rate, it has been difficult to control the gas phase composition, and hence film stoichiometry. In order circumvent these problems we have built and tested a single source MOCVD reactor in which a specially designed vaporizer was employed. This vaporizer can be used to volatilize a stoichiometric mixture of diketonates of yttrium, barium and copper to produce a mixed vapor in a 1:2:3 ratio respectively of the organometellics. This is accomplished even though the three compounds have significantly different volatilities. We have developed a model which provides insight into the process of vaporizing mixed precursors to produce high quality thin films of Y1Ba2Cu3O7. It shows that under steady state conditions the mixed organometallic vapor must have a stoichiometric ratio of the individual organometallics identical to that in the solid mixture.

  19. High rate chemical vapor deposition of carbon films using fluorinated gases

    DOEpatents

    Stafford, Byron L.; Tracy, C. Edwin; Benson, David K.; Nelson, Arthur J.

    1993-01-01

    A high rate, low-temperature deposition of amorphous carbon films is produced by PE-CVD in the presence of a fluorinated or other halide gas. The deposition can be performed at less than 100.degree. C., including ambient room temperature, with a radio frequency plasma assisted chemical vapor deposition process. With less than 6.5 atomic percent fluorine incorporated into the amorphous carbon film, the characteristics of the carbon film, including index of refraction, mass density, optical clarity, and chemical resistance are within fifteen percent (15%) of those characteristics for pure amorphous carbon films, but the deposition rates are high.

  20. Monocrystalline molybdenum silicide based quantum dot superlattices grown by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Savelli, Guillaume; Silveira Stein, Sergio; Bernard-Granger, Guillaume; Faucherand, Pascal; Montès, Laurent

    2016-09-01

    This paper presents the growth of doped monocrystalline molybdenum-silicide-based quantum dot superlattices (QDSL). This is the first time that such nanostructured materials integrating molybdenum silicide nanodots have been grown. QDSL are grown by reduced pressure chemical vapor deposition (RPCVD). We present here their crystallographic structures and chemical properties, as well as the influence of the nanostructuration on their thermal and electrical properties. Particularly, it will be shown some specific characteristics for these QDSL, such as a localization of nanodots between the layers, unlike other silicide based QDSL, an accumulation of doping atoms near the nanodots, and a strong decrease of the thermal conductivity obtained thanks to the nanostructuration.

  1. Removal characteristics of plasma chemical vaporization machining with a pipe electrode for optical fabrication

    SciTech Connect

    Takino, Hideo; Yamamura, Kazuya; Sano, Yasuhisa; Mori, Yuzo

    2010-08-10

    Plasma chemical vaporization machining (CVM) is a high-precision chemical shaping method using rf plasma generated in the proximity of an electrode in an atmospheric environment. The purpose of the present study is to clarify the removal characteristics of plasma CVM using a pipe electrode. Polished fused silica plates were processed by plasma CVM, polishing, and precision grinding under various conditions. The removal rate of plasma CVM was about 4 to 1100 times faster than that of polishing, and the maximum removal rate was almost equal to that of precision grinding. The roughness of the resultant surfaces was almost the same as that of the polished surfaces.

  2. Synthesis of single-crystalline anisotropic gold nano-crystals via chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Manna, Sohini; Kim, Jong Woo; Takahashi, Yukiko; Shpyrko, Oleg G.; Fullerton, Eric E.

    2016-05-01

    We report on a novel one-step catalyst-free, thermal chemical vapor deposition procedure to synthesize gold nanocrystals on silicon substrates. This approach yields single-crystal nanocrystals with various morphologies, such as prisms, icosahedrons, and five-fold twinned decahedrons. Our approach demonstrates that high-quality anisotropic crystals composed of fcc metals can be produced without the need for surfactants or templates. Compared with the traditional wet chemical synthesis processes, our method enables direct formation of highly pure and single crystalline nanocrystals on solid substrates which have applications in catalysis. We investigated the evolution of gold nanocrystals and established their formation mechanism.

  3. STM study of monolayer MoS2 synthesized by Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Mills, Adam; Chen, Chuanhui; Yu, Yifei; Cao, Linyui; Tao, Changgang

    2014-03-01

    Monolayer molybdenum disulfide (MoS2) , an atomically thin transition-metal dichalcogenide semiconductor with a direct band gap, as opposed to an indirect band gap in bulk MoS2, has recently captured a lot of research interest for its distinctive optical and electronic properties, and potential applications such as field effect transistors, optoelectronic devices and chemical sensors. Using scanning tunneling microscopy, we have investigated monolayer MoS2 synthesized by chemical vapor deposition. The structural and electronic properties of monolayer MoS2 grown on glassy carbon and other substrates will be presented. We will also discuss our preliminary scanning tunneling spectroscopy measurements on these samples.

  4. High-quality, faceted cubic boron nitride films grown by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Zhang, W. J.; Jiang, X.; Matsumoto, S.

    2001-12-01

    Thick cubic boron nitride (cBN) films showing clear crystal facets were achieved by chemical vapor deposition. The films show the highest crystallinity of cBN films ever achieved from gas phase. Clear evidence for the growth via a chemical route is obtained. A growth mechanism is suggested, in which fluorine preferentially etches hBN and stabilizes the cBN surface. Ion bombardment of proper energy activates the cBN surface bonded with fluorine so as to enhance the bonding probability of nitrogen-containing species on the F-stabilized B (111) surface.

  5. Predicting the visibility of a chemical vapor plume using schlieren optics

    NASA Astrophysics Data System (ADS)

    Bigger, Rory; Settles, Gary

    2008-11-01

    Chemicals plumes from a freely-evaporating liquid surface and from the exit of a circular pipe are considered. For the freely-evaporating case, the visibility of fourteen chemicals was tested in two schlieren optical systems. One system was a modest bench-top system and the other was a lard system of extraordinary sensitivity. Plume visibility was found to be a function of the vapor pressure and vapor refractive index. An empirical fit to the plume-visibility data, compared with the sensitivities of these systems (measured using a standard-lens method), suggests guidelines for predicting the visibility of plumes of other chemicals using other schlieren equipment. For the circular opening case, plume visibility of the same chemicals was found to be a function of plume geometry and refractive index. The peak light-ray deflections (also measured with a standard lens) caused by plumes of two different sizes were found to scale based on plume geometry. This scaling information and plume refractive index can be used to predict plume visibility for arbitrary chemicals in arbitrary systems, if the system sensitivity is known. One application of this work lies in the optical detection of plumes emitted by contraband material.

  6. Determination of cadmium in water samples by fast pyrolysis-chemical vapor generation atomic fluorescence spectrometry

    NASA Astrophysics Data System (ADS)

    Zhang, Jingya; Fang, Jinliang; Duan, Xuchuan

    2016-08-01

    A pyrolysis-vapor generation procedure to determine cadmium by atomic fluorescence spectrometry has been established. Under fast pyrolysis, cadmium ion can be reduced to volatile cadmium species by sodium formate. The presence of thiourea enhanced the efficiency of cadmium vapor generation and eliminated the interference of copper. The possible mechanism of vapor generation of cadmium was discussed. The optimization of the parameters for pyrolysis-chemical vapor generation, including pyrolysis temperature, amount of sodium formate, concentration of hydrochloric acid, and carrier argon flow rate were carried out. Under the optimized conditions, the absolute and concentration detection limits were 0.38 ng and 2.2 ng ml- 1, respectively, assuming that 0.17 ml of sample was injected. The generation efficiency of was 28-37%. The method was successfully applied to determine trace amounts of cadmium in two certified reference materials of Environmental Water (GSB07-1185-2000 and GSBZ 50009-88). The results were in good agreement with the certified reference values.

  7. Low power, lightweight vapor sensing using arrays of conducting polymer composite chemically-sensitive resistors

    NASA Technical Reports Server (NTRS)

    Ryan, M. A.; Lewis, N. S.

    2001-01-01

    Arrays of broadly responsive vapor detectors can be used to detect, identify, and quantify vapors and vapor mixtures. One implementation of this strategy involves the use of arrays of chemically-sensitive resistors made from conducting polymer composites. Sorption of an analyte into the polymer composite detector leads to swelling of the film material. The swelling is in turn transduced into a change in electrical resistance because the detector films consist of polymers filled with conducting particles such as carbon black. The differential sorption, and thus differential swelling, of an analyte into each polymer composite in the array produces a unique pattern for each different analyte of interest, Pattern recognition algorithms are then used to analyze the multivariate data arising from the responses of such a detector array. Chiral detector films can provide differential detection of the presence of certain chiral organic vapor analytes. Aspects of the spaceflight qualification and deployment of such a detector array, along with its performance for certain analytes of interest in manned life support applications, are reviewed and summarized in this article.

  8. Prediction of Chemical Vapor Deposition Rates on Monofilaments and Its Implications for Fiber Properties

    NASA Technical Reports Server (NTRS)

    Gokoglu, S. A.; Kuczmarski, M.; Veitch, L. C.

    1992-01-01

    Deposition rates are predicted in a cylindrical upflow reactor designed for chemical vapor deposition (CVD) on monofilaments. Deposition of silicon from silane in a hydrogen carrier gas is chosen as a relevant example. The effects of gas and surface chemistry are studied in a two-dimensional axisymmetric flow field for this chemically well-studied system. Model predictions are compared to experimental CVD rate measurements. The differences in some physical and chemical phenomena between such small diameter (about 150 microns) fiber substrates and other typical CVD substrates are highlighted. The influence of the Soret mass transport mechanism is determined to be extraordinarily significant. The difficulties associated with the accurate measurement and control of the fiber temperature are discussed. Model prediction sensitivities are investigated with respect to fiber temperatures, fiber radii, Soret transport, and chemical kinetic parameters. The implications of the predicted instantaneous rates are discussed relative to the desired fiber properties for both the batch and the continuous processes.

  9. Quantum Chemical Simulation of Carbon Nanotube Nucleation on Al2O3 Catalysts via CH4 Chemical Vapor Deposition.

    PubMed

    Page, Alister J; Saha, Supriya; Li, Hai-Bei; Irle, Stephan; Morokuma, Keiji

    2015-07-29

    We present quantum chemical simulations demonstrating how single-walled carbon nanotubes (SWCNTs) form, or "nucleate", on the surface of Al2O3 nanoparticles during chemical vapor deposition (CVD) using CH4. SWCNT nucleation proceeds via the formation of extended polyyne chains that only interact with the catalyst surface at one or both ends. Consequently, SWCNT nucleation is not a surface-mediated process. We demonstrate that this unusual nucleation sequence is due to two factors. First, the π interaction between graphitic carbon and Al2O3 is extremely weak, such that graphitic carbon is expected to desorb at typical CVD temperatures. Second, hydrogen present at the catalyst surface actively passivates dangling carbon bonds, preventing a surface-mediated nucleation mechanism. The simulations reveal hydrogen's reactive chemical pathways during SWCNT nucleation and that the manner in which SWCNTs form on Al2O3 is fundamentally different from that observed using "traditional" transition metal catalysts. PMID:26148208

  10. Aerosol-Assisted Chemical Vapor Deposited Thin Films for Space Photovoltaics

    NASA Technical Reports Server (NTRS)

    Hepp, Aloysius F.; McNatt, Jeremiah; Dickman, John E.; Jin, Michael H.-C.; Banger, Kulbinder K.; Kelly, Christopher V.; AquinoGonzalez, Angel R.; Rockett, Angus A.

    2006-01-01

    Copper indium disulfide thin films were deposited via aerosol-assisted chemical vapor deposition using single source precursors. Processing and post-processing parameters were varied in order to modify morphology, stoichiometry, crystallography, electrical properties, and optical properties in order to optimize device-quality material. Growth at atmospheric pressure in a horizontal hot-wall reactor at 395 C yielded best device films. Placing the susceptor closer to the evaporation zone and flowing a more precursor-rich carrier gas through the reactor yielded shinier, smoother, denser-looking films. Growth of (112)-oriented films yielded more Cu-rich films with fewer secondary phases than growth of (204)/(220)-oriented films. Post-deposition sulfur-vapor annealing enhanced stoichiometry and crystallinity of the films. Photoluminescence studies revealed four major emission bands (1.45, 1.43, 1.37, and 1.32 eV) and a broad band associated with deep defects. The highest device efficiency for an aerosol-assisted chemical vapor deposited cell was 1.03 percent.

  11. Flexible electrochemical capacitors based on polypyrrole/carbon fibers via chemical polymerization of pyrrole vapor

    NASA Astrophysics Data System (ADS)

    Yuan, Wei; Han, Gaoyi; Xiao, Yaoming; Chang, Yunzhen; Liu, Cuixian; Li, Miaoyu; Li, Yanping; Zhang, Ying

    2016-07-01

    Polypyrrole (PPy) has been deposited on the carbon fibers (CFs) via chemical oxidation of monomer vapor strategy, during which FeCl3·6H2O in acetonitrile adsorbed on CFs acts as oxidant to polymerize the pyrrole vapor. The morphologies and capacitive properties of the PPy deposited on CFs (PPy/CFs) are strongly influenced by the concentration of oxidant used in the process. The assembled flexible capacitors by using PPy/CFs as electrodes and LiCl/polyvinyl alcohol as gel electrolyte have been evaluated by cyclic voltammetry, galvanostatic charge/discharge and electrochemical impedance spectroscopy. The results show that the composites of PPy/CFs prepared by using 350 mg mL-1 FeCl3·6H2O as oxidant (PPy/CFs-350) exhibit relatively higher specific capacitance and good rate capability. Compared with PPy/CFs prepared by electrochemical deposition (retaining 5% of the initial capacitance), the PPy/CFs prepared by chemically polymerizing monomer vapor shows excellent stability (retaining 85% of initial capacitance after 5000 cycles). Furthermore, cells fabricated by PPy/CFs show a fairly good performance under various bending states, three cells of PPy/CFs-350 connected in series can light up a light emitting diode with a voltage threshold of about 2.5 V for approximate 10 min after being charged for about 3 min, revealing the potential of the cells' practical applications.

  12. Uptake rate constants and partition coefficients for vapor phase organic chemicals using semipermeable membrane devices (SPMDs)

    USGS Publications Warehouse

    Cranor, W.L.; Alvarez, D.A.; Huckins, J.N.; Petty, J.D.

    2009-01-01

    To fully utilize semipermeable membrane devices (SPMDs) as passive samplers in air monitoring, data are required to accurately estimate airborne concentrations of environmental contaminants. Limited uptake rate constants (kua) and no SPMD air partitioning coefficient (Ksa) existed for vapor-phase contaminants. This research was conducted to expand the existing body of kinetic data for SPMD air sampling by determining kua and Ksa for a number of airborne contaminants including the chemical classes: polycyclic aromatic hydrocarbons, organochlorine pesticides, brominated diphenyl ethers, phthalate esters, synthetic pyrethroids, and organophosphate/organosulfur pesticides. The kuas were obtained for 48 of 50 chemicals investigated and ranged from 0.03 to 3.07??m3??g-1??d-1. In cases where uptake was approaching equilibrium, Ksas were approximated. Ksa values (no units) were determined or estimated for 48 of the chemicals investigated and ranging from 3.84E+5 to 7.34E+7. This research utilized a test system (United States Patent 6,877,724 B1) which afforded the capability to generate and maintain constant concentrations of vapor-phase chemical mixtures. The test system and experimental design employed gave reproducible results during experimental runs spanning more than two years. This reproducibility was shown by obtaining mean kua values (n??=??3) of anthracene and p,p???-DDE at 0.96 and 1.57??m3??g-1??d-1 with relative standard deviations of 8.4% and 8.6% respectively.

  13. Uptake rate constants and partition coefficients for vapor phase organic chemicals using semipermeable membrane devices (SPMDs)

    NASA Astrophysics Data System (ADS)

    Cranor, Walter L.; Alvarez, David A.; Huckins, James N.; Petty, Jimmie D.

    To fully utilize semipermeable membrane devices (SPMDs) as passive samplers in air monitoring, data are required to accurately estimate airborne concentrations of environmental contaminants. Limited uptake rate constants ( kua) and no SPMD air partitioning coefficient ( Ksa) existed for vapor-phase contaminants. This research was conducted to expand the existing body of kinetic data for SPMD air sampling by determining kua and Ksa for a number of airborne contaminants including the chemical classes: polycyclic aromatic hydrocarbons, organochlorine pesticides, brominated diphenyl ethers, phthalate esters, synthetic pyrethroids, and organophosphate/organosulfur pesticides. The kuas were obtained for 48 of 50 chemicals investigated and ranged from 0.03 to 3.07 m 3 g -1 d -1. In cases where uptake was approaching equilibrium, Ksas were approximated. Ksa values (no units) were determined or estimated for 48 of the chemicals investigated and ranging from 3.84E+5 to 7.34E+7. This research utilized a test system (United States Patent 6,877,724 B1) which afforded the capability to generate and maintain constant concentrations of vapor-phase chemical mixtures. The test system and experimental design employed gave reproducible results during experimental runs spanning more than two years. This reproducibility was shown by obtaining mean kua values ( n = 3) of anthracene and p, p'-DDE at 0.96 and 1.57 m 3 g -1 d -1 with relative standard deviations of 8.4% and 8.6% respectively.

  14. MgB 2 thin films by hybrid physical-chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Xi, X. X.; Pogrebnyakov, A. V.; Xu, S. Y.; Chen, K.; Cui, Y.; Maertz, E. C.; Zhuang, C. G.; Li, Qi; Lamborn, D. R.; Redwing, J. M.; Liu, Z. K.; Soukiassian, A.; Schlom, D. G.; Weng, X. J.; Dickey, E. C.; Chen, Y. B.; Tian, W.; Pan, X. Q.; Cybart, S. A.; Dynes, R. C.

    2007-06-01

    Hybrid physical-chemical vapor deposition (HPCVD) has been the most effective technique for depositing MgB 2 thin films. It generates high magnesium vapor pressures and provides a clean environment for the growth of high purity MgB 2 films. The epitaxial pure MgB 2 films grown by HPCVD show higher-than-bulk Tc due to tensile strain in the films. The HPCVD films are the cleanest MgB 2 materials reported, allowing basic research, such as on magnetoresistance, that reveals the two-band nature of MgB 2. The carbon-alloyed HPCVD films demonstrate record-high Hc2 values promising for high magnetic field applications. The HPCVD films and multilayers have enabled the fabrication of high quality MgB 2 Josephson junctions.

  15. Remote catalyzation for growth of boron nitride nanotubes by low pressure chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Wang, Liangjie; Li, Taotao; Ling, Lin; Luo, Jie; Zhang, Kai; Xu, Yancui; Lu, Huifen; Yao, Yagang

    2016-05-01

    Direct deposition of high purity and quality boron nitride nanotubes (BNNTs) on Si substrate were obtained using low pressure chemical vapor deposition (LPCVD). We find Fe-Mg-O species may act as catalysts for growing BNNTs. This synthesis process conforms to vapor-liquid-solid (VLS) growth mechanism. As-grown BNNTs also show a large optical energy band gap of 6.12 eV, approaching to hexagonal phase BN single crystals. Meanwhile, as-grown BNNTs exhibit an intense UV-emission band located at 345 nm and a weak deep band at 237 nm. Their optoelectronic properties make them have promising for future nanoscale deep-UV light emitting devices.

  16. Gas phase versus surface contributions to photolytic laser chemical vapor deposition rates

    NASA Astrophysics Data System (ADS)

    Braichotte, D.; van den Bergh, H.

    1988-04-01

    The rate of cw photolytic laser chemical vapor deposition (LCVD) of platinum is measured for λ≈350 nm as a function of the light intensity and the metalorganic vapor pressure. The growth of the metal films is studied in situ and in real time by monitoring their optical transmission. At low intensities the transmitted light decreases monotonically with time, and the LCVD process is photolytic with its rate limiting step in the surface adlayer. At higher intensities we observe two distinct time domains: Relatively slow initial photolytic deposition with its rate limiting step in the gas phase, which is followed by much faster pyrolytic LCVD. An improved method for distinguishing between adlayer and gas-phase limiting processes is demonstrated. These observations are confirmed by studying the photolytic deposition rates while varying the thickness of the adlayer.

  17. Chemical Vapor Deposition Synthesis and Raman Spectroscopic Characterization of Large-Area Graphene Sheets

    NASA Astrophysics Data System (ADS)

    Liao, Chun-Da; Lu, Yi-Ying; Tamalampudi, Srinivasa Reddy; Cheng, Hung-Chieh; Chen, Yit-Tsong

    2013-10-01

    We present a chemical vapor deposition (CVD) method to catalytically synthesize large-area, transferless, single- to few-layer graphene sheets using hexamethyldisilazane (HMDS) on a SiO2/Si substrate as a carbon source and thermally evaporated alternating Ni/Cu/Ni layers as a catalyst. The as-synthesized graphene films were characterized by Raman spectroscopic imaging to identify single- to few-layer sheets. This HMDS-derived graphene layer is continuous over the entire growth substrate, and single- to trilayer mixed sheets can be up to 30 -m in the lateral dimension. With the synthetic CVD method proposed here, graphene can be grown into tailored shapes directly on a SiO2/Si surface through vapor priming of HMDS onto predefined photolithographic patterns. The transparent and conductive HMDS-derived graphene exhibits its potential for widespread electronic and opto-electronic applications.

  18. Continuous growth of single-wall carbon nanotubes using chemical vapor deposition

    DOEpatents

    Grigorian, Leonid; Hornyak, Louis; Dillon, Anne C; Heben, Michael J

    2014-09-23

    The invention relates to a chemical vapor deposition process for the continuous growth of a carbon single-wall nanotube where a carbon-containing gas composition is contacted with a porous membrane and decomposed in the presence of a catalyst to grow single-wall carbon nanotube material. A pressure differential exists across the porous membrane such that the pressure on one side of the membrane is less than that on the other side of the membrane. The single-wall carbon nanotube growth may occur predominately on the low-pressure side of the membrane or, in a different embodiment of the invention, may occur predominately in between the catalyst and the membrane. The invention also relates to an apparatus used with the carbon vapor deposition process.

  19. Continuous growth of single-wall carbon nanotubes using chemical vapor deposition

    DOEpatents

    Grigorian, Leonid; Hornyak, Louis; Dillon, Anne C; Heben, Michael J

    2008-10-07

    The invention relates to a chemical vapor deposition process for the continuous growth of a carbon single-wall nanotube where a carbon-containing gas composition is contacted with a porous membrane and decomposed in the presence of a catalyst to grow single-wall carbon nanotube material. A pressure differential exists across the porous membrane such that the pressure on one side of the membrane is less than that on the other side of the membrane. The single-wall carbon nanotube growth may occur predominately on the low-pressure side of the membrane or, in a different embodiment of the invention, may occur predominately in between the catalyst and the membrane. The invention also relates to an apparatus used with the carbon vapor deposition process.

  20. MICHIGAN SOIL VAPOR EXTRACTION REMEDIATION (MISER) MODEL: A COMPUTER PROGRAM TO MODEL SOIL VAPOR EXTRACTION AND BIOVENTING OF ORGANIC CHEMICALS IN UNSATURATED GEOLOGICAL MATERIAL

    EPA Science Inventory

    Soil vapor extraction (SVE) and bioventing (BV) are proven strategies for remediation of unsaturated zone soils. Mathematical models are powerful tools that can be used to integrate and quantify the interaction of physical, chemical, and biological processes occurring in field sc...

  1. Functionalization of multi-walled carbon nanotubes using water-assisted chemical vapor deposition

    SciTech Connect

    Ran Maofei; Sun Wenjing; Liu Yan; Chu Wei; Jiang Chengfa

    2013-01-15

    A simple and novel method, water-assisted chemical vapor deposition (CVD) was developed to functionalize multi-walled carbon nanotubes (MWCNTs) during the synthesis process. The functionalized MWCNTs were characterized using Raman spectroscopy, XPS, TGA, NH{sub 3}-TPD, SEM and HR-TEM. It was found that new defects are introduced and the amount of acidic groups is increased on the MWCNT surface during the water-assisted CVD process. The amount of C-OH and C-O group on the MWCNT surface is found to be increased from 21.1% to 42% with water vapor assistance. Density functional theory (DFT) was employed to study the chemical behavior of water vapor molecule on the catalyst particle surface of Ni(1 1 1) cluster. Based on the experimental and DFT simulation results, a mechanism for functionalization of MWCNTs by water-assisted CVD is proposed. - Graphical abstract: Water is adsorbed and activated on Ni surface, then dissociated into OH and O species, followed by part of OH and O species desorbed from the surface. Finally, the desorbed OH and O species oxidize the unsaturated carbon atoms of carbon nanotubes, form defects and oxygen-containing groups. Highlights: Black-Right-Pointing-Pointer MWCNTs were functionalized by water-assisted CVD method. Black-Right-Pointing-Pointer Defects and weak-medium acidic sites were created on the MWCNT sidewalls. Black-Right-Pointing-Pointer Oxygen-containing groups in functionalized MWCNT were increased from 21.1% to 42%. Black-Right-Pointing-Pointer A mechanism for the influence of water vapor on MWCNTs was proposed.

  2. Chemical and physical sputtering effects on the surface morphology of carbon films grown by plasma chemical vapor deposition

    SciTech Connect

    Vazquez, Luis

    2009-08-01

    We have studied the influence of chemical and physical sputtering on the surface morphology of hydrogenated carbon films deposited on silicon substrates by bias-enhanced electron cyclotron resonance chemical vapor deposition. Atomic force microscopy based power spectrum density (PSD) and roughness analysis have been used to investigate the film morphology. This study has been possible due to the appropriate choice of the experimental variables, in particular, gas mixture, resulting in either nitrogen-free (a-C:H) or nitrogenated carbon (a-CN:H) films, and substrate bias (V{sub b}). Under these conditions, chemical sputtering is present for a-CN:H deposition but it is negligible for a-C:H film growth, while physical sputtering processes appear for both systems for V{sub b}<=-85 V. When physical sputtering does not operate, the film growth with simultaneous chemical sputtering leads to a characteristic a-CN:H granular surface morphology. Furthermore, PSD analysis reveals that a spatial correlation of the a-CN:H film surface roughness, up to distances approx300 nm, becomes a fingerprint of the coexistence of growth and chemical erosion processes on the film morphology. However, once physical sputtering takes place, the influence of chemical sputtering by reactive nitrogen species on the final surface morphology becomes negligible and both a-CN:H and a-C:H film morphologies are ultrasmooth.

  3. Copper-vapor-assisted chemical vapor deposition for high-quality and metal-free single-layer graphene on amorphous SiO2 substrate.

    PubMed

    Kim, Hyungki; Song, Intek; Park, Chibeom; Son, Minhyeok; Hong, Misun; Kim, Youngwook; Kim, Jun Sung; Shin, Hyun-Joon; Baik, Jaeyoon; Choi, Hee Cheul

    2013-08-27

    We report that high-quality single-layer graphene (SLG) has been successfully synthesized directly on various dielectric substrates including amorphous SiO2/Si by a Cu-vapor-assisted chemical vapor deposition (CVD) process. The Cu vapors produced by the sublimation of Cu foil that is suspended above target substrates without physical contact catalyze the pyrolysis of methane gas and assist nucleation of graphene on the substrates. Raman spectra and mapping images reveal that the graphene formed on a SiO2/Si substrate is almost defect-free and homogeneous single layer. The overall quality of graphene grown by Cu-vapor-assisted CVD is comparable to that of the graphene grown by regular metal-catalyzed CVD on a Cu foil. While Cu vapor induces the nucleation and growth of SLG on an amorphous substrate, the resulting SLG is confirmed to be Cu-free by synchrotron X-ray photoelectron spectroscopy. The SLG grown by Cu-vapor-assisted CVD is fabricated into field effect transistor devices without transfer steps that are generally required when SLG is grown by regular CVD process on metal catalyst substrates. This method has overcome two important hurdles previously present when the catalyst-free CVD process is used for the growth of SLG on fused quartz and hexagonal boron nitride substrates, that is, high degree of structural defects and limited size of resulting graphene, respectively. PMID:23869700

  4. Investigations of Ta film resistors on chemically vapor deposited diamond plates

    NASA Astrophysics Data System (ADS)

    Zhu, Xiao-Dong; Wang, Hua; Zhan, Ru-Juan; Zhou, Hai-Yang

    1999-12-01

    Ta films were deposited by sputtering on chemically vapor deposited (CVD) diamond plates to be used as resistors for microelectronic applications. The resistance temperature coefficient is only -10 ppm/°C when heating Ta film resistance from room temperature to 150°C. Meanwhile, no reaction is found at the interface between Ta and CVD diamond. These results show the Ta film resistance has high electrical and chemical stability in this temperature range. On the basis of data obtained by differential thermal analysis(DTA), it is found that the endothermic effects begin to appear for Ta/CVD diamond from 300°C. After heating Ta/CVD diamond up to 800°C, XRD analysis indicates that there are strong chemical reactions between Ta and CVD diamond to produce TaC, TaO, and TaO 2.

  5. Significance of vapor phase chemical reactions on CVD rates predicted by chemically frozen and local thermochemical equilibrium boundary layer theories

    NASA Technical Reports Server (NTRS)

    Gokoglu, Suleyman A.

    1988-01-01

    This paper investigates the role played by vapor-phase chemical reactions on CVD rates by comparing the results of two extreme theories developed to predict CVD mass transport rates in the absence of interfacial kinetic barrier: one based on chemically frozen boundary layer and the other based on local thermochemical equilibrium. Both theories consider laminar convective-diffusion boundary layers at high Reynolds numbers and include thermal (Soret) diffusion and variable property effects. As an example, Na2SO4 deposition was studied. It was found that gas phase reactions have no important role on Na2SO4 deposition rates and on the predictions of the theories. The implications of the predictions of the two theories to other CVD systems are discussed.

  6. Surface and bulk absorption characteristics of chemically vapor-deposited zinc selenide in the infrared.

    PubMed

    Klein, C A; Miller, R P; Stierwalt, D L

    1994-07-01

    Chemically vapor-deposited zinc selenide exhibits outstanding properties in the infrared and has been established as a prime material for transmissive optics applications. Here we present and discuss data relating to the surface and the bulk absorption forward-looking infrared- (FLIR-) grade chemically vapor-deposited ZnSe, at wavelengths (2-20 µm) and temperatures (100-500 K) of current interest.

    This investigation is based on both spectral emittance measurements and infrared transmission spectroscopy performed in the context of a systems development program. Surface effects can be detected at wavelengths of up to 14 µm and usually predominate at wavelengths of less than 8 µm. Fractional surface absorptions are temperature independent from approximately 200 to 400 K and can be fitted to a Fourier series, at wavelengths ranging from 3.5 to 13.5 µm. The bulk absorption coefficient (βv) is strongly dependent on temperature as well as wavelength, but it can be approximated by a bivariate polynomial expressin that yields recommended values. At wavelengths λ ≲ 10 µm, βv decreases with increasing temperature; it is shown that a wavelength-independent Debye-Waller factor provides a correct description of the temperature dependence, thus pointing to infrared-active localized modes. At wavelengths λ ≳ 14 µm, βv increases with temperature and exhibits temperature dependencies (T(1.7), T(2.6)) that reflect three- and four-phonon summation processes. Finally, an analysis of the temperature dependence of βv at 10.6 µm demonstrates that the intrinsic lattice dynamical contribution to bulk absorption at this wavelength should be close to 4 × 10(-4) cm(-1), in accord with the results of earlier laser calorimetry tests performed on exceptionally pure laser-grade chemically vapor-deposited ZnSe.

    PMID:20935788

  7. Growth of 2D black phosphorus film from chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Smith, Joshua B.; Hagaman, Daniel; Ji, Hai-Feng

    2016-05-01

    Phosphorene, a novel 2D material isolated from bulk black phosphorus (BP), is an intrinsic p-type material with a variable bandgap for a variety of applications. However, these applications are limited by the inability to isolate large films of phosphorene. Here we present an in situ chemical vapor deposition type approach that demonstrates progress towards growth of large area 2D BP with average areas >3 μm2 and thicknesses representing samples around four layers and thicker samples with average areas >100 μm2. Transmission electron microscopy and Raman spectroscopy have confirmed successful growth of 2D BP from red phosphorus.

  8. Growth of 2D black phosphorus film from chemical vapor deposition.

    PubMed

    Smith, Joshua B; Hagaman, Daniel; Ji, Hai-Feng

    2016-05-27

    Phosphorene, a novel 2D material isolated from bulk black phosphorus (BP), is an intrinsic p-type material with a variable bandgap for a variety of applications. However, these applications are limited by the inability to isolate large films of phosphorene. Here we present an in situ chemical vapor deposition type approach that demonstrates progress towards growth of large area 2D BP with average areas >3 μm2 and thicknesses representing samples around four layers and thicker samples with average areas >100 μm2. Transmission electron microscopy and Raman spectroscopy have confirmed successful growth of 2D BP from red phosphorus. PMID:27087456

  9. Schottky diodes and ohmic contacts formed by thermally assisted photolytic laser chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Braichotte, D.; van den Bergh, H.

    Thermally assisted photolytic laser chemical vapor deposition (LCVD) of platinum on n-doped gallium arsenide, a two-phase hybrid scheme for the production of Schottky diodes, is discussed. The low temperature photolytic deposits of the initial slow phase contain a nonnegligible fraction of organic ligand material and tend to be amorphous. In the second phase, light absorption of the photolytically deposited metal causes a temperature rise which facilitates the removal of ligand material from the deposit, and which is sufficient for fast pyrolytic LCVD. Measurements of the influence of light intensity, in addition to metalorganic and inert gas pressure, on the deposition rates in both phases are obtained.

  10. Thermal conductivity of ultra-thin chemical vapor deposited hexagonal boron nitride films

    NASA Astrophysics Data System (ADS)

    Alam, M. T.; Bresnehan, M. S.; Robinson, J. A.; Haque, M. A.

    2014-01-01

    Thermal conductivity of freestanding 10 nm and 20 nm thick chemical vapor deposited hexagonal boron nitride films was measured using both steady state and transient techniques. The measured value for both thicknesses, about 100 ± 10 W m-1 K-1, is lower than the bulk basal plane value (390 W m-1 K-1) due to the imperfections in the specimen microstructure. Impressively, this value is still 100 times higher than conventional dielectrics. Considering scalability and ease of integration, hexagonal boron nitride grown over large area is an excellent candidate for thermal management in two dimensional materials-based nanoelectronics.

  11. Photoluminescence in Chemical Vapor Deposited ZnS: insight into electronic defects

    SciTech Connect

    McCloy, John S.; Potter, B.g.

    2013-08-09

    Photoluminescence spectra taken from chemical vapor deposited (CVD) ZnS are shown to exhibit sub-band-gap emission bands characteristic of isoelectronic oxygen defects. The emission spectra vary spatially with position and orientation with respect to the major axis of CVD growth. These data suggest that a complex set of defects exist in the band gap of CVD ZnS whose structural nature is highly dependent upon local deposition and growth conditions, contributing to inherent heterogeneity in optical behavior throughout the material.

  12. Chemically vapor deposited silicon carbide (SiC) for optical applications

    NASA Astrophysics Data System (ADS)

    Pickering, Michael A.; Taylor, Raymond L.; Keeley, Joseph T.; Graves, George A.

    1989-10-01

    Important physical, optical, thermal, and mechanical properties of cubic (beta) silicon carbide produced via a bulk chemical vapor deposition (CVD) process, developed at CVD Incorporated, are presented in this paper. The material's properties make it an ideal candidate material for optical components for lidar mirrors, solar collectors and concentrators, and astronomical telescopes. The CVD process has been scaled to produce large monolithic pieces of bulk SiC, i.e., disks up to 60-cm (24-in.) diameter and plates up to 76-cm (30-in.) long by 46-cm (18-in.) wide with thickness up to 13 mm (0.5 in.).

  13. Improvement of uniformity in chemical vapor deposition of silicon carbide by using CFD

    NASA Astrophysics Data System (ADS)

    Seo, Jin-Won; Kim, Jun-Woo; Choi, Kyoon; Lee, Jong-Heun

    2016-01-01

    The chemical vapor deposition (CVD) of silicon carbide (SiC) on carbon has been widely used as a general method to suppress dust generation on carbon surfaces. For a CH3SiCl3 (MTS) and hydrogen system, computational fluid dynamic simulations to predict the growth rate of the silicon carbide are performed. The results of the simulations are consistent with the experimental results where the deposition rate depends highly on the H/Si composition and the specimen's location. This simulation can provide guidance in optimizing the CVD process and improving the apparatus for CVD of SiC.

  14. Fabrication of highly ultramicroporous carbon nanofoams by SF6-catalyzed laser-induced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Hattori, Yoshiyuki; Shuhara, Ai; Kondo, Atsushi; Utsumi, Shigenori; Tanaka, Hideki; Ohba, Tomonori; Kanoh, Hirofumi; Takahashi, Kunimitsu; Vallejos-Burgos, Fernando; Kaneko, Katsumi

    2016-05-01

    We have developed a laser-induced chemical vapor deposition (LCVD) method for preparing nanocarbons with the aid of SF6. This method would offer advantages for the production of aggregates of nanoscale foams (nanofoams) at high rates. Pyrolysis of the as-grown nanofoams induced the high surface area (1120 m2 g-1) and significantly enhanced the adsorption of supercritical H2 (16.6 mg g-1 at 77 K and 0.1 MPa). We also showed that the pyrolized nanofoams have highly ultramicroporous structures. The pyrolized nanofoams would be superior to highly microporous nanocarbons for the adsorption of supercritical gases.

  15. Synthesis of sulfur-doped graphene by using Near-infrared chemical-vapor deposition

    NASA Astrophysics Data System (ADS)

    Choi, Hyonkwang; Jo, Hyung-Ho; Hwang, Sookhyun; Jeon, Minhyon; Kim, Jong-Ho

    2016-06-01

    We here introduced a simple, but efficient, sulfur-doping method applying delta-function-like doping profiles by using near-infrared chemical-vapor deposition. The thermally decomposed sulfur was found to play the role of the n-type dopant, and hydrogen in hydrosulfide gas acted as the reducing agent corresponding to the oxygen functional groups during the growth of the graphene sheet. The doping mechanism by sulfur atoms as a substitutional impurity requires further study due to the increase in the number of unintentional defects in the crystalline graphene.

  16. Grain growth and size distribution in ion-irradiated chemical vapor deposited amorphous silicon

    SciTech Connect

    Spinella, C.; Lombardo, S.; Campisano, S. U.

    1989-07-10

    The amorphous to polycrystal transition in chemical vapor deposited (CVD) amorphous silicon has been studied at 450 /degree/C under Kr ion beam irradiation. The average grain size increases linearly with the ion dose, and the grain size distribution is very narrow compared to thermally grown grains. These results are consistent with the presence of crystal seeds in CVD material. All these seeds can grow simultaneously under ion beam irradiation. For layers completely preamorphized by Ge/sup +/ implantation, no ion beam induced nucleation is observed.

  17. Grain growth kinetics during ion beam irradiation of chemical vapor deposited amorphous silicon

    SciTech Connect

    Spinella, C.; Lombardo, S. ); Campisano, S.U. )

    1990-08-06

    The amorphous to polycrystal transition during Kr ion beam irradiation of chemical vapor deposited silicon layers has been studied in the temperature range 320--480 {degree}C. At each irradiation temperature the average grain diameter increases linearly with the Kr dose, while the grain density remains constant within the experimental accuracy. The growth rate follows a complex behavior which can be described by dynamic defect generation and annihilation. The absolute value of the grain growth rate is equal to that of the ion-assisted epitaxial layer by layer crystallization in the silicon (111) orientation. This result can be related to the crystal grain structure and morphology.

  18. Quantum Hall effect on centimeter scale chemical vapor deposited graphene films

    NASA Astrophysics Data System (ADS)

    Shen, Tian; Wu, Wei; Yu, Qingkai; Richter, Curt A.; Elmquist, Randolph; Newell, David; Chen, Yong P.

    2011-12-01

    We report observations of well developed half integer quantum Hall effect on mono layer graphene films of 7 mm × 7 mm in size. The graphene films are grown by chemical vapor deposition on copper, then transferred to SiO2/Si substrates, with typical carrier mobilities ≈4000 cm2/Vs. The large size graphene with excellent quality and electronic homogeneity demonstrated in this work is promising for graphene-based quantum Hall resistance standards and can also facilitate a wide range of experiments on quantum Hall physics of graphene and practical applications exploiting the exceptional properties of graphene.

  19. Quantum Hall effect on centimeter scale chemical vapor deposited graphene films

    NASA Astrophysics Data System (ADS)

    Shen, Tian; Wu, Wei; Yu, Qingkai; Richter, Curt; Elmquist, Randolph; Newell, David; Chen, Yong

    2012-02-01

    We report observations of well developed half integer quantum Hall effect on mono layer graphene films of 7 mm by 7 mm in size. The graphene films are grown by chemical vapor deposition on copper, then transferred to SiO2/Si substrates, with typical carrier mobilities 4000 cm^2/Vs. The large size graphene with excellent quality and electronic homogeneity demonstrated in this work is promising for graphene-based quantum Hall resistance standards, and can also facilitate a wide range of experiments on quantum Hall physics of graphene and practical applications exploiting the exceptional properties of graphene.

  20. Oxygen and hydrogen effects on the chemical vapor deposition of aluminum nitride films

    SciTech Connect

    Aspar, B.; Armas, B.; Combescure, C. ); Figueras, A.; Rodriguez-Clemente, R. ); Mazel, A.; Kihn, Y.; Sevely, J. )

    1993-06-01

    Aluminum nitride has been obtained by chemical vapor deposition using AlCl[sub 3] and NH[sub 3] as precursors. Progressive introduction of N[sub 2]0 in the gas mixture has shown the possibility of inserting oxygen in the AlN lattice. This involves strong changes of surface morphology of the deposit and the formation of less-crystallized materials. When hydrogen is added to the gas mixture, these effects are reduced, Electron energy loss spectroscopy has shown that, in this case, oxygen is mainly concentrated on the external parts of AlN crystals, the structure of which has been found consistent with the wurtzite structure.

  1. Simulation of chemical-vapor-deposited silicon carbide for a cold wall vertical reactor

    NASA Astrophysics Data System (ADS)

    Lee, Y. L.; Sanchez, J. M.

    1997-07-01

    The growth rate of silicon carbide obtained by low-pressure chemical vapor deposition from tetramethylsilane is numerically simulated for a cold wall vertical reactor. The transport equations for momentum, heat, and mass transfer are simultaneously solved by employing the finite volume method. A model for reaction rate is also proposed in order to predict the measured growth rates [A. Figueras, S. Garelik, J. Santiso, R. Rodroguez-Clemente, B. Armas, C. Combescure, R. Berjoan, J.M. Saurel and R. Caplain, Mater. Sci. Eng. B 11 (1992) 83]. Finally, the effects of thermal diffusion on the growth rate are investigated.

  2. ZnO nanowall network grown by chemical vapor deposition technique

    NASA Astrophysics Data System (ADS)

    Mukherjee, Amrita; Dhar, Subhabrata

    2015-06-01

    Network of wedge shaped ZnO nanowalls are grown on c-sapphire by Chemical Vapor Deposition (CVD) technique. Structural studies using x-ray diffraction show much better crystallinity in the nanowall sample as compared to the continuous film. Moreover, the defect related broad green luminescence is found to be suppressed in the nanowall sample. The low temperature photoluminescence study also suggests the quantum confinement of carriers in nanowall sample. Electrical studies performed on the nanowalls show higher conductivity, which has been explained in terms of the reduction of scattering cross-section as a result of 1D quantum confinement of carriers on the tip of the nanowalls.

  3. Second harmonic generation in ZnO thin films fabricated by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Liu, C. Y.; Zhang, B. P.; Binh, N. T.; Segawa, Y.

    2004-07-01

    Second harmonic generation (SHG) from ZnO thin films fabricated by metalorganic chemical vapor deposition (MOCVD) technique was carried out. By comparing the second harmonic signal generated in a series of ZnO films with different deposition temperatures, we conclude that a significant part of second harmonic signal is generated at the film deposited with appropriate temperature. The second-order susceptibility tensor χ(2)zzz=9.2 pm/V was deduced for a film deposited at 250 °C.

  4. Fatigueless Ferroelectric Capacitors with Ruthenium Bottom and Top Electrodes Formed by Metalorganic Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Furukawa, Taisuke; Kuroiwa, Takeharu; Fujisaki, Yoshihisa; Sato, Takehiko; Ishiwara, Hiroshi

    2005-03-01

    Ferroelectric Ru/Bi4-xLaxTi3O12/Ru capacitors were fabricated by combining metalorganic chemical vapor deposition (MOCVD) of top and bottom Ru electrodes and spin-coating of the ferroelectric film. After optimization of the deposition conditions, good ferroelectric properties (2Pr=18 μC/cm2, Pr: remanent polarization) and low leakage current density (2× 10-6 A/cm2) were achieved. No significant fatigue phenomenon (decrease of Pr) was observed even after 1010 switching cycles.

  5. Tunneling characteristics in chemical vapor deposited graphene–hexagonal boron nitride–graphene junctions

    SciTech Connect

    Roy, T.; Hesabi, Z. R.; Joiner, C. A.; Vogel, E. M.; Liu, L.; Gu, G.; Barrera, S. de la; Feenstra, R. M.; Chakrabarti, B.

    2014-03-24

    Large area chemical vapor deposited graphene and hexagonal boron nitride was used to fabricate graphene–hexagonal boron nitride–graphene symmetric field effect transistors. Gate control of the tunneling characteristics is observed similar to previously reported results for exfoliated graphene–hexagonal boron nitride–graphene devices. Density-of-states features are observed in the tunneling characteristics of the devices, although without large resonant peaks that would arise from lateral momentum conservation. The lack of distinct resonant behavior is attributed to disorder in the devices, and a possible source of the disorder is discussed.

  6. Spectroscopic signatures of AA' and AB stacking of chemical vapor deposited bilayer MoS2

    DOE PAGESBeta

    Xia, Ming; Li, Bo; Yin, Kuibo; Capellini, Giovanni; Niu, Gang; Gong, Yongji; Zhou, Wu; Ajayan, Pulickel M.; Xie, Ya -Hong

    2015-11-04

    We discuss prominent resonance Raman and photoluminescence spectroscopic differences between AA'and AB stacked bilayer molybdenum disulfide (MoS2) grown by chemical vapor deposition are reported. Bilayer MoS2 islands consisting of the two stacking orders were obtained under identical growth conditions. Also, resonance Raman and photoluminescence spectra of AA' and AB stacked bilayer MoS2 were obtained on Au nanopyramid surfaces under strong plasmon resonance. Both resonance Raman and photoluminescence spectra show distinct features indicating clear differences in interlayer interaction between these two phases. The implication of these findings on device applications based on spin and valley degrees of freedom.

  7. Method of making AlInSb by metal-organic chemical vapor deposition

    DOEpatents

    Biefeld, Robert M.; Allerman, Andrew A.; Baucom, Kevin C.

    2000-01-01

    A method for producing aluminum-indium-antimony materials by metal-organic chemical vapor deposition (MOCVD). This invention provides a method of producing Al.sub.X In.sub.1-x Sb crystalline materials by MOCVD wherein an Al source material, an In source material and an Sb source material are supplied as a gas to a heated substrate in a chamber, said Al source material, In source material, and Sb source material decomposing at least partially below 525.degree. C. to produce Al.sub.x In.sub.1-x Sb crystalline materials wherein x is greater than 0.002 and less than one.

  8. Chemical vapor deposition techniques and related methods for manufacturing microminiature thermionic converters

    DOEpatents

    King, Donald B.; Sadwick, Laurence P.; Wernsman, Bernard R.

    2002-06-25

    Methods of manufacturing microminiature thermionic converters (MTCs) having high energy-conversion efficiencies and variable operating temperatures using MEMS manufacturing techniques including chemical vapor deposition. The MTCs made using the methods of the invention incorporate cathode to anode spacing of about 1 micron or less and use cathode and anode materials having work functions ranging from about 1 eV to about 3 eV. The MTCs also exhibit maximum efficiencies of just under 30%, and thousands of the devices can be fabricated at modest costs.

  9. Growth and Characteristics of Freestanding Hemispherical Diamond Films by Microwave Plasma Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Wang, Qi-Liang; Lü, Xian-Yi; Li, Liu-An; Cheng, Shao-Heng; Li, Hong-Dong

    2010-04-01

    Freestanding hemispherical diamond films have been fabricated by microwave plasma chemical vapor deposition using graphite and molybdenum (Mo) as substrates. Characterized by Raman spectroscopy and scanning electron microscopy, the crystalline quality of the films deposited on Mo is higher than that on graphite, which is attributed to the difference in intrinsic properties of the two substrates. By decreasing the methane concentration, the diamond films grown on the Mo substrate vary from black to white, and the optical transparency is enhanced. After polishing the growth side, the diamond films show an infrared transmittance of 35-60% in the range 400-4000 cm-1.

  10. Deposition of aligned bamboo-like carbon nanotubes via microwave plasma enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Cui, H.; Zhou, O.; Stoner, B. R.

    2000-11-01

    Aligned multiwall carbon nanotubes have been grown on silicon substrates by microwave plasma enhanced chemical vapor deposition using methane/ammonia mixtures. Scanning electron microscopy shows that the nanotubes are well aligned with high aspect ratio and growth direction normal to the substrate. Transmission electron microscopy reveals that the majority phase has a bamboo-like structure. Data are also presented showing process variable effects on the size and microstructure of the aligned nanotubes, giving insight into possible nucleation and growth mechanisms for the process.

  11. Diameter-controlled growth of carbon nanotubes using thermal chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Lee, Cheol Jin; Lyu, Seung Chul; Cho, Young Rae; Lee, Jin Ho; Cho, Kyoung Ik

    2001-06-01

    The diameter and the growth rate of vertically aligned carbon nanotubes (CNTs) are controlled by modulating the size of catalytic particles using thermal chemical vapor deposition (CVD). The size of iron catalytic particles deposited on silicon oxide substrate is varied in a controlled manner by adjusting the condition of ammonia pretreatment. We found an inverse relation between the diameter and growth rate of carbon nanotubes. As the diameter increases, the compartment layers of bamboo-shaped carbon nanotubes appear more frequently, which is suitably explained by the base growth mechanism.

  12. Synthesis of vertically aligned carbon nanotubes on a large area using thermal chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Lee, C. J.; Son, K. H.; Lee, T. J.; Lyu, S. C.; Yoo, J. E.

    2001-10-01

    Vertically well-aligned carbon nanotubes (CNTs) were homogeneously grown on iron deposited silicon oxide substrate by thermal chemical vapor deposition of acetylene. The CNTs have an uniform length of 100 μm and a diameter in the range from 100 to 200 nm. The CNTs reveal closed tip and very clean surface without any carbonaceous particles. The CNTs have no encapsulated iron particles at the closed tip and a bamboo structure in which the curvature of compartment layers is directed to the tip.

  13. Fabrication of AIN Nano-Structures Using Polarity Control by High Temperature Metalorganic Chemical Vapor Deposition.

    PubMed

    Eom, Daeyong; Kim, Jinwan; Lee, Kyungjae; Jeon, Minhwan; Heo, Cheon; Pyeon, Jaedo; Nam, Okhyun

    2015-07-01

    This study investigates the crystallographic polarity transition of AIN layers grown by high temperature metalorganic chemical vapor deposition (HT-MOCVD), with varying trimethylaluminum (TMAI) pre-flow rates. AIN layers grown without TMAI pre-flow had a mixed polarity, consisting of Al- and N-polarity, and exhibited a rough surface. With an increasing rate of TMAI pre-flow, the AIN layer was changed to an Al-polarity, with a smooth surface morphology. Finally, AIN nano-pillars and nano-rods of Al-polarity were fabricated by etching a mixed polarity AIN layer using an aqueous KOH solution. PMID:26373093

  14. Observation of defects in mercury cadmium telluride crystals grown by chemical vapor transport

    NASA Technical Reports Server (NTRS)

    Irene, E. A.; Tierney, E.; Wiedemeier, H.; Chandra, D.

    1983-01-01

    A mixture of nitric and hydrochloric acids was found to yield etch pits on mercury cadmium telluride crystals grown by chemical vapor transport using iodine or mercuric iodide as the transport agent. Two types of pits were observed by optical microscopy: triangular pyramidal and round saucer shaped pits. Transmission electron microscopy confirmed that two types of defects were present: dislocations and second phase occlusions. The present study suggests that the defects are near the crystal surface and therefore will probably not significantly affect the electrical characteristics.

  15. Development of a polysilicon process based on chemical vapor deposition, phase 1

    NASA Technical Reports Server (NTRS)

    Plahutnik, F.; Arvidson, A.; Sawyer, D.

    1982-01-01

    The goal of this program is to demonstrate that a dichlorosilane-based reductive chemical vapor deposition (CVD) process is capable of producing, at low cost, high quality polycrystalline silicon. Physical form and purity of this material will be consistent with LSA material requirements for use in the manufacture of high efficiency solar cells. Four polysilicon deposition runs were completed in an intermediate size reactor using dichlorosilane fed from 250 pound cylinders. Results from the intermediate size reactor are consistent with those obtained earlier with a small experimental reactor. Modifications of two intermediate size reactors were completed to interface with the dichlorosilane process demonstration unit (PDU).

  16. Atmospheric pressure chemical vapor deposition of CdTe—reactor design considerations

    NASA Astrophysics Data System (ADS)

    Meyers, Peter V.; Kee, Robert J.; Raja, Laxminarayan; Wolden, Colin A.; Aire, Michael

    1999-03-01

    Atmospheric Pressure Chemical Vapor Deposition (APCVD) of polycrystalline thin-film CdTe appears to offer several practical advantages over state-of-the-art manufacturing techniques. APCVD employs the same reaction chemistry utilized to produce 16% efficient CdTe cells (i.e., same reaction chemistry as Close Spaced Sublimation), avoids use of vacuum equipment, allows for physical separation of the source and substrate, and employs forced convection to ensure uniform delivery of source material over large-area substrates. Reactor design considerations and preliminary numerical simulations of mass transport are presented.

  17. Chemical-Vapor Deposition Of Cd1-xMnxTe

    NASA Technical Reports Server (NTRS)

    Nouhi, Akbar; Stirn, Richard J.

    1989-01-01

    Experimental process makes films with interesting magnetic and magneto-optical properties. Films of dilute magnetic semiconductor alloy Cd1-xMnxTe deposited on glass and GaAs substrates by metalorganic chemical-vapor deposition (MOCVD). Devices made with Cd1-xMnxTe films known to exhibit strong photoluminescence, stimulated emission, and magnetically-tunable lasing action. In addition, energy-band gaps of such material tailored by altering its composition - property giving flexibility in development of high-efficiency cascade solar photovoltaic cells. Performs at atmospheric pressure, resulting in more-uniform films, covering larger area, and enabling higher production rate.

  18. Microstructure and properties of multiphase and functionally graded materials prepared by chemical vapor deposition

    SciTech Connect

    Lee, W.Y.

    1996-05-01

    The synthesis of multiphase and functionally graded materials by chemical vapor deposition is discussed from a perspective of controlling their composition and microstructure at a nano-scale level, and ultimately, tailoring their material properties. Prior research is briefly reviewed to address the current state of this novel material concept. Recent experimental results relating to controlling the selected properties of two multiphase systems, TiN + MoS{sub 2} and NiAl + Al{sub 2}O{sub 3}, are described to illustrate this concept`s potential merits and challenges for use in realistic applications.

  19. Influence of Alumina Reaction Tube Impurities on the Oxidation of Chemically-Vapor-Deposited Silicon Carbide

    NASA Technical Reports Server (NTRS)

    Opila, Elizabeth

    1995-01-01

    Pure coupons of chemically vapor deposited (CVD) SiC were oxidized for 100 h in dry flowing oxygen at 1300 C. The oxidation kinetics were monitored using thermogravimetry (TGA). The experiments were first performed using high-purity alumina reaction tubes. The experiments were then repeated using fused quartz reaction tubes. Differences in oxidation kinetics, scale composition, and scale morphology were observed. These differences were attributed to impurities in the alumina tubes. Investigators interested in high-temperature oxidation of silica formers should be aware that high-purity alumina can have significant effects on experiment results.

  20. Formation of needlelike crystallites during growth of diamond films by chemical vapor deposition

    SciTech Connect

    Kopylov, P. G.; Obraztsov, A. N. Shvets, P. V.

    2010-07-15

    Diamond polycrystalline films have been grown by chemical vapor deposition from a hydrogenmethane mixture. The phase composition and structure of the films were studied using Raman spectroscopy, electron microscopy, and thermogravimetry. It is found that, upon heating in air, the oxidation of the carbon material forming the films occurs at significantly different temperatures, depending on the degree of its order and the crystallite size. This difference is used for selective oxidation of the least ordered fine-grained component of the films. The material obtained by this selective oxidation of the films consists of diamond crystallites shaped like regular micrometer-sized tetragonal pyramids with a radius of tip curvature of several nanometers.

  1. Effect of sulfur on the growth of carbon nanotubes by detonation-assisted chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Wang, Can; Zhan, Liang; Wang, Yan-li; Qiao, Wen-Ming; Liang, Xiaoyi; Ling, Li-Cheng

    2010-11-01

    Thiophene was introduced as an additive in detonation-assisted chemical vapor deposition to investigate the effect of sulfur on the growth of carbon nanotubes. The results reveal that sulfur promoted the growth of hollow tubes, instead of bamboo-like carbon nanotubes without sulfur addition. Structural characterization of products indicates that the dynamic reshaping of the catalyst assisted bamboo-like carbon nanotube growth and the bamboo knots preferentially nucleated on the Ni-graphite step edges. It is suggested that sulfur suppressed the bamboo knot growth through blocking the step sites. The findings are important for understanding of nanotube growth mechanism and the role of sulfur often involved in catalytic reactions.

  2. Fabrication of Carbon Nanotubes by Slot-Excited Microwave Plasma-Enhanced Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Shim, Gyu Il; Kojima, Yoshihiro; Kono, Satoshi; Ohno, Yutaka; Ishijima, Tatsuo

    2008-07-01

    Carbon nanotubes (CNTs) are fabricated by adopting plasma-enhanced chemical vapor deposition (PECVD) with a planar microwave plasma source. Plasma is produced by a slot antenna at 2.45-GHz microwave injection in CH4/H2 mixture. In this study, it is shown that avoiding the exposure of the substrate to the plasma drastically improves the CNT growth. Furthermore, it is found that the CNT quality can be controlled with the optimization of one of the steps in the catalyst treatment, such as the preheating procedure; the treated catalyst is considered to be unaffected by the heating in the high-density microwave plasma treatment during the CNT growth.

  3. Fabrication of Carbon Nanotube Field Effect Transistors Using Plasma-Enhanced Chemical Vapor Deposition Grown Nanotubes

    NASA Astrophysics Data System (ADS)

    Ohnaka, Hirofumi; Kojima, Yoshihiro; Kishimoto, Shigeru; Ohno, Yutaka; Mizutani, Takashi

    2006-06-01

    Single-walled carbon nanotubes are grown using grid-inserted plasma-enhanced chemical vapor deposition (PECVD). The field effect transistor operation was confirmed using the PECVD grown carbon nanotubes (CNTs). The preferential growth of the semiconducting nanotubes was confirmed in the grid-inserted PECVD by measuring current-voltage (I-V) characteristics of the devices. Based on the measurement of the electrical breakdown of the metallic CNTs, the probability of growing the semiconducting nanotubes has been estimated to be more than 90%.

  4. Chemical vapor deposition synthesis and photoluminescence properties of ZnS hollow microspheres

    SciTech Connect

    Pi Zhengbang; Su Xiaolu; Yang Chao; Tian Xike Pei Fang; Zhang Suxin; Zhen Jianhua

    2008-08-04

    ZnS hollow microspheres were prepared via a facile template-free chemical vapor deposition (CVD) route using metallic zinc powders and sulphur sublimed as reactants. The products were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), and energy-dispersive X-ray spectrometer (EDX). The results showed that the as-prepared ZnS hollow spheres had uniform size about 4-8 {mu}m in diameter. The growth mechanism of such interesting was discussed. The optical property of the products was also recorded by means of photoluminescence (PL) spectroscopy.

  5. Localized planarization of optical damage using laser-based chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Matthews, Manyalibo J.; Elhadj, Selim; Guss, Gabe M.; Sridharan, Arun; Nielsen, Norman D.; Yoo, Jae-Hyuck; Lee, Daeho; Grigoropoulos, Costas

    2013-11-01

    We present a method to repair damaged optics using laser-based chemical vapor deposition (L-CVD). A CO2 laser is used to heat damaged silica regions and polymerize a gas precursor to form SiO2. Measured deposition rates and morphologies agree well with finite element modeling of a two-phase reaction. Along with optimizing deposition rates and morphology, we also show that the deposited silica is structurally identical to high-grade silica substrate and possesses high UV laser damage thresholds. Successful application of such a method could reduce processing costs, extend optic lifetime, and lead to more damage resistant laser optics used in high power applications.

  6. Studies on non-oxide coating on carbon fibers using plasma enhanced chemical vapor deposition technique

    NASA Astrophysics Data System (ADS)

    Patel, R. H.; Sharma, S.; Prajapati, K. K.; Vyas, M. M.; Batra, N. M.

    2016-05-01

    A new way of improving the oxidative behavior of carbon fibers coated with SiC through Plasma Enhanced Chemical Vapor Deposition technique. The complete study includes coating of SiC on glass slab and Stainless steel specimen as a starting test subjects but the major focus was to increase the oxidation temperature of carbon fibers by PECVD technique. This method uses relatively lower substrate temperature and guarantees better stoichiometry than other coating methods and hence the substrate shows higher resistance towards mechanical and thermal stresses along with increase in oxidation temperature.

  7. Alignment of nanoparticles, nanorods, and nanowires during chemical vapor deposition of silicon

    NASA Astrophysics Data System (ADS)

    Swain, Bhabani Sankar; Park, Jin-Woo; Yang, Seung-Min; Mahmood, Khalid; Swain, Bibhu Prasad; Lee, Jae-Gab; Hwang, Nong-Moon

    2015-09-01

    We fabricated silicon nanostructures (Si-NSs) on SiO x /Si substrate in chemical vapor deposition. During the synthesis of Si-NSs, Si sunflower-shaped structures of one to hundred microns were observed, therein the nanoparticles (NPs), nanowires, and nanorods were aligned in an ordered manner. We suggest that the NSs reported here are evolved by the electrostatic force exerted by charged NPs in gas phase. This NS would help in understanding the role of spontaneous charging of NPs in the gas phase and the role of charged NPs in the gas phase for NSs growth.

  8. Observation of spin-charge conversion in chemical-vapor-deposition-grown single-layer graphene

    SciTech Connect

    Ohshima, Ryo; Sakai, Atsushi; Ando, Yuichiro; Shiraishi, Masashi; Shinjo, Teruya; Kawahara, Kenji; Ago, Hiroki

    2014-10-20

    Conversion of pure spin current to charge current in single-layer graphene (SLG) is investigated by using spin pumping. Large-area SLG grown by chemical vapor deposition is used for the conversion. Efficient spin accumulation in SLG by spin pumping enables observing an electromotive force produced by the inverse spin Hall effect (ISHE) of SLG. The spin Hall angle of SLG is estimated to be 6.1 × 10{sup −7}. The observed ISHE in SLG is ascribed to its non-negligible spin-orbit interaction in SLG.

  9. Characteristics of epitaxial garnets grown by CVD using single metal alloy sources. [Chemical Vapor Deposition

    NASA Technical Reports Server (NTRS)

    Besser, P. J.; Hamilton, T. N.; Mee, J. E.; Stermer, R. L.

    1974-01-01

    Single metal alloys have been explored as the cation source in the chemical vapor deposition (CVD) of iron garnets. Growth of good quality single crystal garnet films containing as many as five different cations has been achieved over a wide range of deposition conditions. The relationship of film composition to alloy compositions and deposition conditions has been determined for several materials. By proper choice of the alloy composition and the deposition conditions, uncrazed deposits were grown on (111) gadolinium gallium garnet (GGG) substrates. Data on physical, magnetic and optical properties of representative films is presented and discussed.

  10. Spectroscopic Signatures of AA' and AB Stacking of Chemical Vapor Deposited Bilayer MoS2.

    PubMed

    Xia, Ming; Li, Bo; Yin, Kuibo; Capellini, Giovanni; Niu, Gang; Gong, Yongji; Zhou, Wu; Ajayan, Pulickel M; Xie, Ya-Hong

    2015-12-22

    Prominent resonance Raman and photoluminescence spectroscopic differences between AA' and AB stacked bilayer molybdenum disulfide (MoS2) grown by chemical vapor deposition are reported. Bilayer MoS2 islands consisting of the two stacking orders were obtained under identical growth conditions. Resonance Raman and photoluminescence spectra of AA' and AB stacked bilayer MoS2 were obtained on Au nanopyramid surfaces under strong plasmon resonance. Both resonance Raman and photoluminescence spectra show distinct features indicating clear differences in interlayer interaction between these two phases. The implication of these findings on device applications based on spin and valley degrees of freedom will be discussed. PMID:26536495

  11. Synthesis and Characterization of Tin(IV) Oxide Obtained by Chemical Vapor Deposition Method.

    PubMed

    Nagirnyak, Svitlana V; Lutz, Victoriya A; Dontsova, Tatiana A; Astrelin, Igor M

    2016-12-01

    The effect of precursors on the characteristics of tin oxide obtained by chemical vapor deposition (CVD) method was investigated. The synthesis of nanosized tin(IV) oxide was carried out with the use of two different precursors: tin(II) oxalate obtained using tin chloride(II) and oxalic acid; tin(II) oxalate obtained using tin chloride(II); and ammonium oxalate. The synthesized tin(IV) oxide samples were studied by electron microscopy, X-ray diffraction and optical spectra. The lattice parameters of tin(IV) oxide samples were defined, the bandgap of samples were calculated. PMID:27456501

  12. Synthesis and Characterization of Tin(IV) Oxide Obtained by Chemical Vapor Deposition Method

    NASA Astrophysics Data System (ADS)

    Nagirnyak, Svitlana V.; Lutz, Victoriya A.; Dontsova, Tatiana A.; Astrelin, Igor M.

    2016-07-01

    The effect of precursors on the characteristics of tin oxide obtained by chemical vapor deposition (CVD) method was investigated. The synthesis of nanosized tin(IV) oxide was carried out with the use of two different precursors: tin(II) oxalate obtained using tin chloride(II) and oxalic acid; tin(II) oxalate obtained using tin chloride(II); and ammonium oxalate. The synthesized tin(IV) oxide samples were studied by electron microscopy, X-ray diffraction and optical spectra. The lattice parameters of tin(IV) oxide samples were defined, the bandgap of samples were calculated.

  13. Preparation of low-resistivity n-type ZnSe by organometallic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Stutius, W.

    1981-03-01

    Low-resistivity n-type ZnSe with p<0.05 W cm and n≳1017 cm-3 has been grown epitaxially on (100) GaAs substrates by a low-pressure low-temperature organometallic chemical vapor deposition process. Triethylaluminum is used as a dopant. The as-grown layers show a strong near-band-gap photoluminescence peak. The much weaker photoluminescence intensity at longer wavelength indicates that the concentration of deep centers is lower than in doped ZnSe prepared by other methods.

  14. Single crystal chemical vapor deposit diamond detector for energetic plasma measurement in space

    NASA Astrophysics Data System (ADS)

    Ogasawara, K.; Broiles, T. W.; Coulter, K. E.; Dayeh, M. A.; Desai, M. I.; Livi, S. A.; McComas, D. J.; Walther, B. C.

    2015-03-01

    This study reports the performance of single crystal chemical vapor deposit diamond detectors for measuring space plasma and energetic particles: ~7 keV energy resolution for protons with a 14 keV threshold level, and good response linearity for ions and electrons as expected from Monte-Carlo calculations of primary particle energy loss. We investigated that these diamond detectors are able to operate at high temperature (> 70 ° C) and have fast response times (< 1 ns rise time). While silicon detectors have proven capability over this energy range for space plasma measurements, diamond detectors offer a faster response, higher temperature operation, greater radiation tolerance, and immunity to light.

  15. Boron coating on boron nitride coated nuclear fuels by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Durmazuçar, Hasan H.; Gündüz, Güngör

    2000-12-01

    Uranium dioxide-only and uranium dioxide-gadolinium oxide (5% and 10%) ceramic nuclear fuel pellets which were already coated with boron nitride were coated with thin boron layer by chemical vapor deposition to increase the burn-up efficiency of the fuel during reactor operation. Coating was accomplished from the reaction of boron trichloride with hydrogen at 1250 K in a tube furnace, and then sintering at 1400 and 1525 K. The deposited boron was identified by infrared spectrum. The morphology of the coating was studied by using scanning electron microscope. The plate, grainy and string (fiber)-like boron structures were observed.

  16. Multi-Walled Carbon Nanotube Growth in Multi-Walled Carbon Nanotubes by Chemical Vapor Deposition.

    PubMed

    Hasegawa, Takayuki; Arenas, Daniel J; Kohno, Hideo

    2015-02-01

    We report chemical vapor deposition (CVD) growth of a multi-walled carbon nanotube (MWCNT) inside another MWCNTs from a cementite (Fe3C) catalyst nanoparticles. The CNTs have bi or tri-layered core(s)-sheath structure with various crystallinity. The sheath grows first at a lower temperature, and then the catalyst nanoparticle works again to grow the core(s) at a higher temperature in the tip or root growth mode. Transmission electron microscopy (TEM) observation provides a clear piece of evidence of reverse-inward growth. PMID:26353735

  17. Chemical Species in the Vapor Phase of Hanford Double-Shell Tanks: Potential Impacts on Waste Tank Corrosion Processes

    SciTech Connect

    Felmy, Andrew R.; Qafoku, Odeta; Arey, Bruce W.; Boomer, Kayle D.

    2010-09-22

    The presence of corrosive and inhibiting chemicals on the tank walls in the vapor space, arising from the waste supernatant, dictate the type and degree of corrosion that occurs there. An understanding of how waste chemicals are transported to the walls and the affect on vapor species from changing supernatant chemistry (e.g., pH, etc.), are basic to the evaluation of risks and impacts of waste changes on vapor space corrosion (VSC). In order to address these issues the expert panel workshop on double-shell tank (DST) vapor space corrosion testing (RPP-RPT-31129) participants made several recommendations on the future data and modeling needs in the area of DST corrosion. In particular, the drying of vapor phase condensates or supernatants can form salt or other deposits at the carbon steel interface resulting in a chemical composition at the near surface substantially different from that observed directly in the condensates or the supernatants. As a result, over the past three years chemical modeling and experimental studies have been performed on DST supernatants and condensates to predict the changes in chemical composition that might occur as condensates or supernatants equilibrate with the vapor space species and dry at the carbon steel surface. The experimental studies included research on both the chemical changes that occurred as the supernatants dried as well as research on how these chemical changes impact the corrosion of tank steels. The chemical modeling and associated experimental studies were performed at the Pacific Northwest National Laboratory (PNNL) and the research on tank steel corrosion at the Savannah River National Laboratory (SRNL). This report presents a summary of the research conducted at PNNL with special emphasis on the most recent studies conducted in FY10. An overall summary of the project results as well as their broader implications for vapor space corrosion of the DST’s is given at the end of this report.

  18. Microstructure-property relationships of chemically vapor deposited zirconia fiber coating for environmentally durable silicon carbide/silicon carbide composites

    NASA Astrophysics Data System (ADS)

    Li, Hao

    In SiC/SiC ceramic matrix composites, toughness is obtained by adding a fiber coating, which provides a weak interface for crack deflection and debonding between the fiber and the matrix. However, the most commonly used fiber coatings, carbon and boron nitride, are unstable in oxidative environments. In the present study, the feasibility of using a chemically vapor deposited zirconia (CVD-ZrO2) fiber coating as an oxidation-resistant interphase for SiC/SiC composites was investigated. A study of morphological evolution in the CVD-ZrO2 coating suggested that a size-controlled displacive phase transformation from tetragonal ZrO2 ( t-ZrO2) to monoclinic ZrO2 (m-ZrO 2) was the key mechanism responsible for the weak interface behavior exhibited by the ZrO2 coating. It appeared that a low oxygen partial pressure in the CVD reactor chamber was essential for the nucleation of t-ZrO2 and therefore was responsible for the delamination behavior. With this understanding of the weak interface mechanism, minicomposite specimens containing various ZrO2 fiber coating morphologies were fabricated and tested. A fractographic analysis showed that in-situ fiber strength and minicomposite failure loads were strongly dependent on the phase contents and microstructure of the ZrO2 coating. We determined that an optimum microstructure of the ZrO2 coating should contain a predelaminated interface surrounded by a dense outer layer. The outer layer was needed to protect the fiber from degradation during the subsequent SiC matrix infiltration procedure. A preliminary tensile stress-rupture study indicated that the ZrO2 coating exhibited promising performance in terms of providing the weak interface behavior and maintaining the thermal and oxidative stability at elevated temperatures.

  19. Opportunities and challenges in GaN metal organic chemical vapor deposition for electron devices

    NASA Astrophysics Data System (ADS)

    Matsumoto, Koh; Yamaoka, Yuya; Ubukata, Akinori; Arimura, Tadanobu; Piao, Guanxi; Yano, Yoshiki; Tokunaga, Hiroki; Tabuchi, Toshiya

    2016-05-01

    The current situation and next challenge in GaN metal organic chemical vapor deposition (MOCVD) for electron devices of both GaN on Si and GaN on GaN are presented. We have examined the possibility of increasing the growth rate of GaN on 200-mm-diameter Si by using a multiwafer production MOCVD machine, in which the vapor phase parasitic reaction is well controlled. The impact of a high-growth-rate strained-layer-superlattice (SLS) buffer layer is presented in terms of material properties. An SLS growth rate of as high as 3.46 µm/h, which was 73% higher than the current optimum, was demonstrated. As a result, comparable material properties were obtained. Next, a typical result of GaN doped with Si of 1 × 1016 cm‑3 grown at the growth rate of 3.7 µm/h is shown. For high-voltage application, we need a thick high-purity GaN drift layer with a low carbon concentration, of less than 1016 cm‑3. It is shown that achieving a high growth rate by precise control of the vapor phase reaction is still challenge in GaN MOCVD.

  20. Aromatic chemicals by iron-catalyzed hydrotreatment of lignin pyrolysis vapor.

    PubMed

    Olcese, Roberto Nicolas; Lardier, George; Bettahar, Mohammed; Ghanbaja, Jaafar; Fontana, Sébastien; Carré, Vincent; Aubriet, Frédéric; Petitjean, Dominique; Dufour, Anthony

    2013-08-01

    Lignin is a potential renewable material for the production of bio-sourced aromatic chemicals. We present the first hydrotreatment of lignin pyrolysis vapors, before any condensation, using inexpensive and sustainable iron-silica (Fe/SiO2 ) and iron-activated carbon (Fe/AC) catalysts. Lignin pyrolysis was conducted in a tubular reactor and vapors were injected in a fixed bed of catalysts (673 K, 1 bar) with stacks to investigate the profile of coke deposit. More than 170 GC-analyzable compounds were identified by GCxGC (heart cutting)/flame ionization detector mass spectrometry. Lignin oligomers were analyzed by very high resolution mass spectrometry, called the "petroleomic" method. They are trapped by the catalytic fixed bed and, in particular, by the AC. The catalysts showed a good selectivity for the hydrodeoxygenation of real lignin vapors to benzene, toluene, xylenes, phenol, cresols, and alkyl phenols. The spent catalysts were characterized by temperature-programmed oxidation, transmission electron microscopy (TEM), and N2 sorption. Micropores in the Fe/AC catalyst are completely plugged by coke deposits, whereas the mesoporous structure of Fe/SiO2 is unaffected. TEM images reveal two different types of coke deposit: 1) catalytic coke deposited in the vicinity of iron particles and 2) thermal coke (carbonaceous particles ≈1 μm in diameter) formed from the gas-phase growth of lignin oligomers. PMID:23784799

  1. Relevance of thermodynamic and kinetic parameters of chemical vapor deposition precursors.

    PubMed

    Selvakumar, J; Nagaraja, K S; Sathiyamoorthy, D

    2011-09-01

    We have studied various metallorganic and organometallic compounds by simultaneous nonisothermal thermogravimetric and differential thermogravimetric analyses to confirm their volatility and thermal stability. The equilibrium vapor pressures of the metallorganic and organometallic compounds were determined by horizontal dual arm single furnace thermoanalyzer as transpiration apparatus. Antoine coefficients were calculated from the temperature dependence equilibrium vapor pressure data. The model-fitting solid-state kinetic analyses of Al(acac)3, (acac = acetylacetonato), Cr(CO)6, Fe(Cp)2, (Cp-cyclopentadienyl), Ga(acac)3, Mn(tmhd)3, and Y(tmhd)3 (tmhd = 2,2,6,6,-tetramethyl-3,5-heptanedionato) revealed that the processes follow diffusion controlled, contracting area and zero order model sublimation or evaporation kinetics. The activation energy for the sublimation/evaporation processes were calculated by model-free kinetic methods. Thin films of nickel and lanthanum-strontium-manganite (LSM) are grown on silicon substrate at 573 K using selected metallorganic complexes of Ni[(acac)2en], La(tmhd)3, Sr(tmhd)2 and Mn(tmhd)3 as precursors by plasma assisted liquid injection chemical vapor deposition (PA-LICVD). The deposited films were characterized by scanning electron microscopy and energy dispersive X-ray analysis for their composition and morphology. PMID:22097553

  2. A mathematical model and simulation results of plasma enhanced chemical vapor deposition of silicon nitride films

    NASA Astrophysics Data System (ADS)

    Konakov, S. A.; Krzhizhanovskaya, V. V.

    2015-01-01

    We developed a mathematical model of Plasma Enhanced Chemical Vapor Deposition (PECVD) of silicon nitride thin films from SiH4-NH3-N2-Ar mixture, an important application in modern materials science. Our multiphysics model describes gas dynamics, chemical physics, plasma physics and electrodynamics. The PECVD technology is inherently multiscale, from macroscale processes in the chemical reactor to atomic-scale surface chemistry. Our macroscale model is based on Navier-Stokes equations for a transient laminar flow of a compressible chemically reacting gas mixture, together with the mass transfer and energy balance equations, Poisson equation for electric potential, electrons and ions balance equations. The chemical kinetics model includes 24 species and 58 reactions: 37 in the gas phase and 21 on the surface. A deposition model consists of three stages: adsorption to the surface, diffusion along the surface and embedding of products into the substrate. A new model has been validated on experimental results obtained with the "Plasmalab System 100" reactor. We present the mathematical model and simulation results investigating the influence of flow rate and source gas proportion on silicon nitride film growth rate and chemical composition.

  3. Fabrication of carbon nanofiber-reinforced aluminum matrix composites assisted by aluminum coating formed on nanofiber surface by in situ chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Ogawa, Fumio; Masuda, Chitoshi

    2015-01-01

    The van der Waals agglomeration of carbon nanofibers (CNFs) and the weight difference and poor wettability between CNFs and aluminum hinder the fabrication of dense CNF-reinforced aluminum matrix composites with superior properties. In this study, to improve this situation, CNFs were coated with aluminum by a simple and low-cost in situ chemical vapor deposition (in situ CVD). Iodine was used to accelerate the transport of aluminum atoms. The coating layer formed by the in situ CVD was characterized using scanning electron microscopy, transmission electron microscopy, x-ray diffraction, Fourier transform-infrared spectroscopy, and x-ray photoelectron spectroscopy. The results confirmed that the CNFs were successfully coated with aluminum. The composites were fabricated to investigate the effect of the aluminum coating formed on the CNFs. The dispersion of CNFs, density, Vickers micro-hardness and thermal conductivity of the composites fabricated by powder metallurgy were improved. Pressure-less infiltration experiments were conducted to fabricate composites by casting. The results demonstrated that the wettability and infiltration were dramatically improved by the aluminum coating layer on CNFs. The aluminum coating formed by the in situ CVD technique was proved to be effective for the fabrication of CNF-reinforced aluminum matrix composites.

  4. Growth and characterization of boron doped graphene by Hot Filament Chemical Vapor Deposition Technique (HFCVD)

    NASA Astrophysics Data System (ADS)

    Jafari, A.; Ghoranneviss, M.; Salar Elahi, A.

    2016-03-01

    Large-area boron doped graphene was synthesized on Cu foil (as a catalyst) by Hot Filament Chemical Vapor Deposition (HFCVD) using boron oxide powder and ethanol vapor. To investigate the effect of different boron percentages, grow time and the growth mechanism of boron-doped graphene, scanning electron microscopy (SEM), Raman scattering and X-ray photoelectron spectroscopy (XPS) were applied. Also in this experiment, the I-V characteristic carried out for study of electrical property of graphene with keithley 2361 system. Nucleation of graphene domains with an average domain size of ~20 μm was observed when the growth time is 9 min that has full covered on the Cu surface. The Raman spectroscopy show that the frequency of the 2D band down-shifts with B doping, consistent with the increase of the in-plane lattice constant, and a weakening of the B-C in-plane bond strength relative to that of C-C bond. Also the shifts of the G-band frequencies can be interpreted in terms of the size of the C-C ring and the changes in the electronic structure of graphene in the presence of boron atoms. The study of electrical property shows that by increasing the grow time the conductance increases which this result in agree with SEM images and graphene grain boundary. Also by increasing the boron percentage in gas mixer the conductance decreases since doping graphene with boron creates a band-gap in graphene band structure. The XPS results of B doped graphene confirm the existence of boron in doped graphene, which indicates the boron atoms doped in the graphene lattice are mainly in the form of BC3. The results showed that boron-doped graphene can be successfully synthesized using boron oxide powder and ethanol vapor via a HFCVD method and also chemical boron doping can be change the electrical conductivity of the graphene.

  5. Chemical sensing of copper phthalocyanine sol-gel glass through organic vapors

    SciTech Connect

    Ridhi, R.; Gawri, Isha; Abbas, Saeed J.; Saini, G. S. S.; Tripathi, S. K.

    2015-05-15

    The sensitivities of metallophthalocyanine to vapor phase electron donors has gained significance in many areas and disciplines due to their sensing properties and ease of operation. In the present study the interaction mechanism of organic vapors in Copper Phthalocyanine (CuPc) sol-gel glass has been studied. The interaction mechanism is affected by many factors like morphology, electrical or optical properties of film. CuPc sol-gel glass has been synthesized using chemical route sol-gel method. Its structural characterization was conducted using XRD and the amorphous nature of the silicate glass was observed with characteristic α polymorph phase of CuPc at around 6.64° with 13.30Å interplanar spacing. The size of the particle as determined using Debbye Scherre’s formula comes out around 15.5 nm. The presence of α phase of CuPc was confirmed using FTIR with the appearance of crystal parameter marker band at 787 cm-1. Apart from this A2u and Eu symmetry bands of CuPc have also been observed. The UV absorption spectrum of CuPc exhibits absorption peaks owing to π→ π* and n→ π* transitions. A blue shift in the prepared CuPc glass has been observed as compared to the dopant CuPc salt indicating increase of band gap. A split in B (Soret) band and Q band appears as observed with the help of Lorentzian fitting. CuPc sol gel glass has been exposed with chemical vapors of Methanol, Benzene and Bromine individually and the electrical measurements have been carried out. These measurements show the variation in conductivity and the interaction mechanism has been analyzed.

  6. Chemical sensing of copper phthalocyanine sol-gel glass through organic vapors

    NASA Astrophysics Data System (ADS)

    Ridhi, R.; Gawri, Isha; Abbas, Saeed J.; Saini, G. S. S.; Tripathi, S. K.

    2015-05-01

    The sensitivities of metallophthalocyanine to vapor phase electron donors has gained significance in many areas and disciplines due to their sensing properties and ease of operation. In the present study the interaction mechanism of organic vapors in Copper Phthalocyanine (CuPc) sol-gel glass has been studied. The interaction mechanism is affected by many factors like morphology, electrical or optical properties of film. CuPc sol-gel glass has been synthesized using chemical route sol-gel method. Its structural characterization was conducted using XRD and the amorphous nature of the silicate glass was observed with characteristic α polymorph phase of CuPc at around 6.64˚ with 13.30Å interplanar spacing. The size of the particle as determined using Debbye Scherre's formula comes out around 15.5 nm. The presence of α phase of CuPc was confirmed using FTIR with the appearance of crystal parameter marker band at 787 cm-1. Apart from this A2u and Eu symmetry bands of CuPc have also been observed. The UV absorption spectrum of CuPc exhibits absorption peaks owing to π→ π* and n→ π* transitions. A blue shift in the prepared CuPc glass has been observed as compared to the dopant CuPc salt indicating increase of band gap. A split in B (Soret) band and Q band appears as observed with the help of Lorentzian fitting. CuPc sol gel glass has been exposed with chemical vapors of Methanol, Benzene and Bromine individually and the electrical measurements have been carried out. These measurements show the variation in conductivity and the interaction mechanism has been analyzed.

  7. Chemical vapor deposition of ZrC within a spouted bed by bromide process

    NASA Astrophysics Data System (ADS)

    Ogawa, T.; Ikawa, K.; Iwamoto, K.

    1981-03-01

    ZrC coatings by chemical vapor deposition were applied to particles of ThO 2, UO 2 and Al 2O 3 at 1623-1873 K. The feed gas mixture consisted of ZrBr 4, CH 4, H 2 and Ar. The results were compared with the calculated chemical equilibria in the Zr-C-H-Br system. It was shown that the weight and composition of the deposit can be calculated by thermochemical analysis after correcting the methane flow rate for a pyrolysis efficiency. Predominant reaction presumably occurring were derived by a mass balance consideration on the calculated equilibrium species. A simplified model of the ZrC deposition was proposed.

  8. Characterization of chemical-vapor-deposited low-k thin films using x-ray porosimetry

    NASA Astrophysics Data System (ADS)

    Lee, Hae-Jeong; Lin, Eric K.; Bauer, Barry J.; Wu, Wen-li; Hwang, Byung Keun; Gray, William D.

    2003-02-01

    Trimethylsilane-based carbon-doped silica films prepared with varying chemical-vapor-deposition process conditions were characterized using x-ray reflectivity and porosimetry to measure the film thickness, average film density, density depth profile, wall density, and porosity. Samples deposited under single or dual frequency conditions with either N2O or O2 as an oxidant were compared. The structural parameters were correlated with the chemical bond structure measured by Fourier transform infrared spectroscopy. The density profiles of the porous films were uniform with a slight densification at the film surface. The distribution of pores was also uniform through the film. Films prepared under a single frequency and/or N2O atmosphere had the lowest film density, wall density, and dielectric constant. The porosities of the films were similar and the pore sizes were less than 10 Å.

  9. One-step chemical vapor growth of Ge/SiC(x)N(y) nanocables.

    PubMed

    Mathur, Sanjay; Shen, Hao; Donia, Nicole; Rügamer, Thomas; Sivakov, Vladimir; Werner, Ulf

    2007-08-01

    Single-step synthesis of one-dimensional Ge/SiCxNy core-shell nanocables was achieved by chemical vapor deposition of the molecular precursor [Ge{N(SiMe3)2}2]. Single crystalline Ge nanowires (diameter approximately 60 nm) embedded in uniform SiCxNy shells were obtained in high yields, whereby the growth process was not influenced by the nature of substrates. The shell material exhibited high oxidation and chemical resistance at elevated temperatures (up to 250 degrees C) resulting in the preservation of size-dependent semiconductor properties of germanium nanowires, such as intact transport of charge carriers and reduction of energy consumption, when compared to pure Ge nanowires. PMID:17629271

  10. Synthesis of graphene by chemical vapor deposition: effect of growth conditions.

    PubMed

    Su, Dan; Ren, Mingwei; Li, Xing'ao; Huang, Wei

    2013-10-01

    Graphene has attracted a great deal of attention due to its extraordinary physical and chemical properties. But the control of growth of high-quality, large-area and inexpensive graphene is still the bottleneck for practical applications. Chemical vapor deposition (CVD) has become the most common method for graphene growth due to its high production and large area of product. However, it generally suffers from an uncontrollable carbon precipitation effect that leads to inhomogeneous growth and strongly dependent on to the growth conditions. Until now, scientists have struggled to synthesize higher quality, larger area graphene through changing the experimental conditions. In this review, the progress made in the last few years concerning the exploration of preparation graphene by CVD is summarized in three aspects (catalysts, precursors and experimental parameters) that influence graphene growth. PMID:24245104

  11. Synthesis of carbon nanowall by plasma-enhanced chemical vapor deposition method.

    PubMed

    Liu, Rulin; Chi, Yaqing; Fang, Liang; Tang, Zhensen; Yi, Xun

    2014-02-01

    Plasma-enhanced chemical vapor deposition (PECVD) is widely used for the synthesis of carbon materials, such as diamond-like carbons (DLCs), carbon nanotubes (CNTs) and carbon nanowalls (CNWs). Advantages of PECVD are low synthesis temperature compared with thermal CVD and the ability to grow vertically, free-standing structures. Due to its self-supported property and high specific surface area, CNWs are a promising material for field emission devices and other chemical applications. This article reviews the recent process on the synthesis of CNW by the PECVD method. We briefly introduce the structure and properties of CNW with characterization techniques. Growth mechanism is also discussed to analyze the influence of plasma conditions, substrates, temperature, and other parameters to the final film, which will give a suggestion on parameter modulation for desired film. PMID:24749447

  12. Kinetics of gas-phase reactions relevant to the chemical vapor deposition of indium compounds

    SciTech Connect

    Allendorf, M.D.; McDaniel, A.H.

    1998-03-01

    Compounds containing indium are of interest for electronic and optical applications. These compounds include III-V semiconductors such as InP and InAs used in both electronic devices and solar cells, and indium tin oxide, which can be used for optical memory and antireflection coatings. Chemical vapor deposition (CVD) techniques can be used to deposit these materials on a variety of substrates. At the temperatures typically employed (550--900 K), gas-phase chemical reactions involving the indium-containing precursor can occur. The kinetics of trimethylindium pyrolysis are investigated in a flow reactor equipped with a molecular-beam mass-spectrometric sampling system. Data are analyzed using a new computational approach that accounts for heat and mass transport in the reactor. The measured activation energy, 46.2 kcal/mol, is in good agreement with previously reported values.

  13. Development of Single Crystal Chemical Vapor Deposition Diamonds for Detector Applications

    SciTech Connect

    Kagan, Harris; Kass, Richard; Gan, K. K.

    2014-01-23

    With the LHC upgrades in 2013, and further LHC upgrades scheduled in 2018, most LHC experiments are planning for detector upgrades which require more radiation hard technologies than presently available. At present all LHC experiments now have some form of diamond detector. As a result Chemical Vapor Deposition (CVD) diamond has now been used extensively in beam conditions monitors as the innermost detectors in the highest radiation areas of all LHC experiments. Moreover CVD diamond is now being discussed as an alternative sensor material for tracking very close to the interaction region of the HL-LHC where the most extreme radiation conditions will exist. Our work addressed the further development of the new material, single-crystal Chemical Vapor Deposition diamond, towards reliable industrial production of large pieces and new geometries needed for detector applications. Our accomplishments include: • Developed a two U.S.companies to produce electronic grade diamond, • Worked with companies and acquired large area diamond pieces, • Performed radiation hardness tests using various proton energies: 70 MeV (Cyric, Japan), 800 MeV (Los Alamos), and 24 GeV (CERN).

  14. Graphene-assisted growth of high-quality AlN by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Zeng, Qing; Chen, Zhaolong; Zhao, Yun; Wei, Tongbo; Chen, Xiang; Zhang, Yun; Yuan, Guodong; Li, Jinmin

    2016-08-01

    High-quality AlN films were directly grown on graphene/sapphire substrates by metalorganic chemical vapor deposition (MOCVD). The graphene layers were directly grown on sapphire by atmospheric-pressure chemical vapor deposition (APCVD), a low-cost catalyst-free method. We analyzed the influence of the graphene layer on the nucleation of AlN at the initial stage of growth and found that sparse AlN grains on graphene grew and formed a continuous film via lateral coalescence. Graphene-assisted AlN films are smooth and continuous, and the full width at half maximum (FWHM) values for (0002) and (10\\bar{1}2) reflections are 360 and 622.2 arcsec, which are lower than that of the film directly grown on sapphire. The high-resolution TEM images near the AlN/sapphire interface for graphene-assisted AlN films clearly show the presence of graphene, which kept its original morphology after the 1200 °C growth of AlN.

  15. Low Temperature Direct Growth of Graphene Films on Transparent Substrates by Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Antoine, Geoffrey Sandosh Jeffy

    Graphene, two dimensional sheet of carbon atoms has recently gained attention as some of its properties are very useful for electronics, optoelectronics and photovoltaic applications. Its high mobility makes it useful in radio-frequency applications and its transparency makes it useful as transparent electrodes in photovoltaics. It is known that chemical vapor deposition (CVD) is one of the techniques that can be used to synthesize graphene. A lot of work has been done on selecting appropriate substrates and hydrocarbon sources. Nickel, having a high solubility at high temperatures has been in focus lately. Ethylene which has a lower breaking point compared to other hydrocarbons has a good efficiency in the synthesis of graphene. Complexity associated with graphene synthesis and transfers onto transparent substrates constitute the major obstacles to using this material for photovoltaics and optoelectronics applications. Here we show a novel method of obtaining graphene directly on glass via chemical vapor deposition (CVD) using ethylene as the hydrocarbon source and nickel as the catalyst. The low cracking temperature of ethylene which is 542.8 °C permits us to use glass substrates directly in the CVD furnace. To improve the thickness of graphene, a good manipulation of pressure and hydrogen during the growth process will be useful. We introduce a novel catalyst etching technique after the growth results in graphene settling down on the glass substrate in a transfer-free process. Raman spectroscopy indicated good uniformity and high quality before and after the etching process.

  16. Large improvement of phosphorus incorporation efficiency in n-type chemical vapor deposition of diamond

    SciTech Connect

    Ohtani, Ryota; Yamamoto, Takashi; Janssens, Stoffel D.; Yamasaki, Satoshi

    2014-12-08

    Microwave plasma enhanced chemical vapor deposition is a promising way to generate n-type, e.g., phosphorus-doped, diamond layers for the fabrication of electronic components, which can operate at extreme conditions. However, a deeper understanding of the doping process is lacking and low phosphorus incorporation efficiencies are generally observed. In this work, it is shown that systematically changing the internal design of a non-commercial chemical vapor deposition chamber, used to grow diamond layers, leads to a large increase of the phosphorus doping efficiency in diamond, produced in this device, without compromising its electronic properties. Compared to the initial reactor design, the doping efficiency is about 100 times higher, reaching 10%, and for a very broad doping range, the doping efficiency remains highly constant. It is hypothesized that redesigning the deposition chamber generates a higher flow of active phosphorus species towards the substrate, thereby increasing phosphorus incorporation in diamond and reducing deposition of phosphorus species at reactor walls, which additionally reduces undesirable memory effects.

  17. Electronic Properties of Large-scale Graphene Chemical Vapor Synthesized on Nickel and on Sapphire

    NASA Astrophysics Data System (ADS)

    Cao, Helin; Zhang, Liyuan; Chen, Yong; Yu, Qingkai; Li, Hao

    2009-03-01

    We have studied the electronic transport properties of large area few-layer graphene/graphitic films grown by two different chemical vapor based methods. The first type of samples (metal-transfer graphene) is synthesized by carbon segregation from Ni, then transferred to SiO2/Si substrates. The second type of samples is synthesized by direct chemical vapor deposition (CVD) on sapphire. We measured these samples under variable temperatures (from 2K to 300 K) and transverse magnet fields (from 0 to 7 T). For both types of samples, we found a negative magnetoresistance at low field, and carrier mobilities on the order of several hundreds of cm^2/V-s. For metal-transfer graphene in particular, we were able to measure a moderate field effect response, using the highly doped Si substrate as back gate. The observed magnetoresistance shows characteristic features of weak localization, from which we extract various carrier scattering lengths in the metal-transfer graphene samples. Comparison with those measured in mechanically exfoliated graphene suggests possibly different carrier scattering mechanisms for graphene materials prepared with different methods.

  18. Noncatalytic thermocouple coatings produced with chemical vapor deposition for flame temperature measurements.

    PubMed

    Bahlawane, N; Struckmeier, U; Kasper, T S; Osswald, P

    2007-01-01

    Chemical vapor deposition (CVD) and metal-organic chemical vapor deposition (MOCVD) have been employed to develop alumina thin films in order to protect thermocouples from catalytic overheating in flames and to minimize the intrusion presented to the combustion process. Alumina films obtained with a CVD process using AlCl(3) as the precursor are dense, not contaminated, and crystallize in the corundum structure, while MOCVD using Al(acetyl acetone)(3) allows the growth of corundum alumina with improved growth rates. These films, however, present a porous columnar structure and show some carbon contamination. Therefore, coated thermocouples using AlCl(3)-CVD were judged more suitable for flame temperature measurements and were tested in different fuels over a typical range of stoichiometries. Coated thermocouples exhibit satisfactory measurement reproducibility, no temporal drifts, and do not suffer from catalytic effects. Furthermore, their increased radiative heat loss (observed by infrared spectroscopy) allows temperature measurements over a wider range when compared to uncoated thermocouples. A flame with a well-known temperature profile established with laser-based techniques was used to determine the radiative heat loss correction to account for the difference between the apparent temperature measured by the coated thermocouple and the true flame temperature. The validity of the correction term was confirmed with temperature profile measurements for several flames previously studied in different laboratories with laser-based techniques. PMID:17503931

  19. Suitable alkaline for graphene peeling grown on metallic catalysts using chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Karamat, S.; Sonuşen, S.; Çelik, Ü.; Uysallı, Y.; Oral, A.

    2016-04-01

    In chemical vapor deposition, the higher growth temperature roughens the surface of the metal catalyst and a delicate method is necessary for the transfer of graphene from metal catalyst to the desired substrates. In this work, we grow graphene on Pt and Cu foil via ambient pressure chemical vapor deposition (AP-CVD) method and further alkaline water electrolysis was used to peel off graphene from the metallic catalyst. We used different electrolytes i.e., sodium hydroxide (NaOH), potassium hydroxide (KOH), lithium hydroxide (LiOH) and barium hydroxide Ba(OH)2 for electrolysis, hydrogen bubbles evolved at the Pt cathode (graphene/Pt/PMMA stack) and as a result graphene layer peeled off from the substrate without damage. The peeling time for KOH and LiOH was ∼6 min and for NaOH and Ba(OH)2 it was ∼15 min. KOH and LiOH peeled off graphene very efficiently as compared to NaOH and Ba(OH)2 from the Pt electrode. In case of copper, the peeling time is ∼3-5 min. Different characterizations like optical microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and atomic force microscopy were done to analyze the as grown and transferred graphene samples.

  20. Opening of triangular hole in triangular-shaped chemical vapor deposited hexagonal boron nitride crystal

    PubMed Central

    Sharma, Subash; Kalita, Golap; Vishwakarma, Riteshkumar; Zulkifli, Zurita; Tanemura, Masaki

    2015-01-01

    In-plane heterostructure of monolayer hexagonal boron nitride (h-BN) and graphene is of great interest for its tunable bandgap and other unique properties. Here, we reveal a H2-induced etching process to introduce triangular hole in triangular-shaped chemical vapor deposited individual h-BN crystal. In this study, we synthesized regular triangular-shaped h-BN crystals with the sizes around 2-10 μm on Cu foil by chemical vapor deposition (CVD). The etching behavior of individual h-BN crystal was investigated by annealing at different temperature in an H2:Ar atmosphere. Annealing at 900 °C, etching of h-BN was observed from crystal edges with no visible etching at the center of individual crystals. While, annealing at a temperature ≥950 °C, highly anisotropic etching was observed, where the etched areas were equilateral triangle-shaped with same orientation as that of original h-BN crystal. The etching process and well-defined triangular hole formation can be significant platform to fabricate planar heterostructure with graphene or other two-dimensional (2D) materials. PMID:25994455

  1. Polymer Thin Films and Surface Modification by Chemical Vapor Deposition: Recent Progress.

    PubMed

    Chen, Nan; Kim, Do Han; Kovacik, Peter; Sojoudi, Hossein; Wang, Minghui; Gleason, Karen K

    2016-06-01

    Chemical vapor deposition (CVD) polymerization uses vapor phase monomeric reactants to synthesize organic thin films directly on substrates. These thin films are desirable as conformal surface engineering materials and functional layers. The facile tunability of the films and their surface properties allow successful integration of CVD thin films into prototypes for applications in surface modification, device fabrication, and protective films. CVD polymers also bridge microfabrication technology with chemical and biological systems. Robust coatings can be achieved via CVD methods as antifouling, anti-icing, and antihydrate surfaces, as well as stimuli-responsive or biocompatible polymers and novel nanostructures. Use of low-energy input, modest vacuum, and room-temperature substrates renders CVD polymerization compatible with thermally sensitive substrates and devices. Compared with solution-based methods, CVD is particularly useful for insoluble materials, such as electrically conductive polymers and controllably crosslinked networks, and has the potential to reduce environmental, health, and safety impacts associated with solvents. This review discusses the relevant background and selected applications of recent advances by two methods that display and use the high retention of the organic functional groups from their respective monomers, initiated CVD (iCVD) and oxidative CVD (oCVD) polymerization. PMID:27276550

  2. Large improvement of phosphorus incorporation efficiency in n-type chemical vapor deposition of diamond

    NASA Astrophysics Data System (ADS)

    Ohtani, Ryota; Yamamoto, Takashi; Janssens, Stoffel D.; Yamasaki, Satoshi; Koizumi, Satoshi

    2014-12-01

    Microwave plasma enhanced chemical vapor deposition is a promising way to generate n-type, e.g., phosphorus-doped, diamond layers for the fabrication of electronic components, which can operate at extreme conditions. However, a deeper understanding of the doping process is lacking and low phosphorus incorporation efficiencies are generally observed. In this work, it is shown that systematically changing the internal design of a non-commercial chemical vapor deposition chamber, used to grow diamond layers, leads to a large increase of the phosphorus doping efficiency in diamond, produced in this device, without compromising its electronic properties. Compared to the initial reactor design, the doping efficiency is about 100 times higher, reaching 10%, and for a very broad doping range, the doping efficiency remains highly constant. It is hypothesized that redesigning the deposition chamber generates a higher flow of active phosphorus species towards the substrate, thereby increasing phosphorus incorporation in diamond and reducing deposition of phosphorus species at reactor walls, which additionally reduces undesirable memory effects.

  3. Noncatalytic thermocouple coatings produced with chemical vapor deposition for flame temperature measurements

    NASA Astrophysics Data System (ADS)

    Bahlawane, N.; Struckmeier, U.; Kasper, T. S.; Oßwald, P.

    2007-01-01

    Chemical vapor deposition (CVD) and metal-organic chemical vapor deposition (MOCVD) have been employed to develop alumina thin films in order to protect thermocouples from catalytic overheating in flames and to minimize the intrusion presented to the combustion process. Alumina films obtained with a CVD process using AlCl3 as the precursor are dense, not contaminated, and crystallize in the corundum structure, while MOCVD using Al(acetylwidth="0.3em"/>acetone)3 allows the growth of corundum alumina with improved growth rates. These films, however, present a porous columnar structure and show some carbon contamination. Therefore, coated thermocouples using AlCl3-CVD were judged more suitable for flame temperature measurements and were tested in different fuels over a typical range of stoichiometries. Coated thermocouples exhibit satisfactory measurement reproducibility, no temporal drifts, and do not suffer from catalytic effects. Furthermore, their increased radiative heat loss (observed by infrared spectroscopy) allows temperature measurements over a wider range when compared to uncoated thermocouples. A flame with a well-known temperature profile established with laser-based techniques was used to determine the radiative heat loss correction to account for the difference between the apparent temperature measured by the coated thermocouple and the true flame temperature. The validity of the correction term was confirmed with temperature profile measurements for several flames previously studied in different laboratories with laser-based techniques.

  4. A systematic study of atmospheric pressure chemical vapor deposition growth of large-area monolayer graphene†

    PubMed Central

    Liu, Lixin; Zhou, Hailong; Cheng, Rui; Chen, Yu; Lin, Yung-Chen; Qu, Yongquan; Bai, Jingwei; Ivanov, Ivan A.; Liu, Gang

    2012-01-01

    Graphene has attracted considerable interest as a potential material for future electronics. Although mechanical peel is known to produce high quality graphene flakes, practical applications require continuous graphene layers over a large area. The catalyst-assisted chemical vapor deposition (CVD) is a promising synthetic method to deliver wafer-sized graphene. Here we present a systematic study on the nucleation and growth of crystallized graphene domains in an atmospheric pressure chemical vapor deposition (APCVD) process. Parametric studies show that the mean size of the graphene domains increases with increasing growth temperature and CH4 partial pressure, while the density of domains decreases with increasing growth temperature and is independent of the CH4 partial pressure. Our studies show that nucleation of graphene domains on copper substrate is highly dependent on the initial annealing temperature. A two-step synthetic process with higher initial annealing temperature but lower growth temperature is developed to reduce domain density and achieve high quality full-surface coverage of monolayer graphene films. Electrical transport measurements demonstrate that the resulting graphene exhibits a high carrier mobility of up to 3000 cm2 V−1 s−1 at room temperature. PMID:25414547

  5. Opening of triangular hole in triangular-shaped chemical vapor deposited hexagonal boron nitride crystal.

    PubMed

    Sharma, Subash; Kalita, Golap; Vishwakarma, Riteshkumar; Zulkifli, Zurita; Tanemura, Masaki

    2015-01-01

    In-plane heterostructure of monolayer hexagonal boron nitride (h-BN) and graphene is of great interest for its tunable bandgap and other unique properties. Here, we reveal a H2-induced etching process to introduce triangular hole in triangular-shaped chemical vapor deposited individual h-BN crystal. In this study, we synthesized regular triangular-shaped h-BN crystals with the sizes around 2-10 μm on Cu foil by chemical vapor deposition (CVD). The etching behavior of individual h-BN crystal was investigated by annealing at different temperature in an H2:Ar atmosphere. Annealing at 900 °C, etching of h-BN was observed from crystal edges with no visible etching at the center of individual crystals. While, annealing at a temperature ≥ 950 °C, highly anisotropic etching was observed, where the etched areas were equilateral triangle-shaped with same orientation as that of original h-BN crystal. The etching process and well-defined triangular hole formation can be significant platform to fabricate planar heterostructure with graphene or other two-dimensional (2D) materials. PMID:25994455

  6. Opening of triangular hole in triangular-shaped chemical vapor deposited hexagonal boron nitride crystal

    NASA Astrophysics Data System (ADS)

    Sharma, Subash; Kalita, Golap; Vishwakarma, Riteshkumar; Zulkifli, Zurita; Tanemura, Masaki

    2015-05-01

    In-plane heterostructure of monolayer hexagonal boron nitride (h-BN) and graphene is of great interest for its tunable bandgap and other unique properties. Here, we reveal a H2-induced etching process to introduce triangular hole in triangular-shaped chemical vapor deposited individual h-BN crystal. In this study, we synthesized regular triangular-shaped h-BN crystals with the sizes around 2-10 μm on Cu foil by chemical vapor deposition (CVD). The etching behavior of individual h-BN crystal was investigated by annealing at different temperature in an H2:Ar atmosphere. Annealing at 900 °C, etching of h-BN was observed from crystal edges with no visible etching at the center of individual crystals. While, annealing at a temperature ≥950 °C, highly anisotropic etching was observed, where the etched areas were equilateral triangle-shaped with same orientation as that of original h-BN crystal. The etching process and well-defined triangular hole formation can be significant platform to fabricate planar heterostructure with graphene or other two-dimensional (2D) materials.

  7. Patterned growth of carbon nanotubes obtained by high density plasma chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Mousinho, A. P.; Mansano, R. D.

    2015-03-01

    Patterned growth of carbon nanotubes by chemical vapor deposition represents an assembly approach to place and orient nanotubes at a stage as early as when they are synthesized. In this work, the carbon nanotubes were obtained at room temperature by High Density Plasmas Chemical Vapor Deposition (HDPCVD) system. This CVD system uses a new concept of plasma generation, where a planar coil coupled to an RF system for plasma generation was used with an electrostatic shield for plasma densification. In this mode, high density plasmas are obtained. We also report the patterned growth of carbon nanotubes on full 4-in Si wafers, using pure methane plasmas and iron as precursor material (seed). Photolithography processes were used to pattern the regions on the silicon wafers. The carbon nanotubes were characterized by micro-Raman spectroscopy, the spectra showed very single-walled carbon nanotubes axial vibration modes around 1590 cm-1 and radial breathing modes (RBM) around 120-400 cm-1, confirming that high quality of the carbon nanotubes obtained in this work. The carbon nanotubes were analyzed by atomic force microscopy and scanning electron microscopy too. The results showed that is possible obtain high-aligned carbon nanotubes with patterned growth on a silicon wafer with high reproducibility and control.

  8. Investigation of forced and isothermal chemical vapor infiltrated SiC/SiC ceramic matrix composites. Final report

    SciTech Connect

    Sankar, J.; Kelkar, A.D.; Vaidyanathan, R.

    1993-09-01

    Mechanical properties of two different layups for each of the forced CVI (41 specimens) and isothermal CVI (36 specimens) materials were investigated in air at room temperature (RT), 1000C, and at room temperature after thermal shock (RT/TS) and exposure to oxidation (RT/OX). The FCVI specimens had a nominal interfacial coating thickness of 0.3 {mu}m of pyrolytic carbon, while CVI specimens had a coating thickness of 0.1 {mu}m. Effect of reinforcement and interfacial bond on mechanical properties of composite were investigated. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) were employed to analyze the fiber-matrix interface and the toughening mechanisms in this ceramic composite system.

  9. Chemical etching and organometallic chemical vapor deposition on varied geometries of GaAs

    NASA Technical Reports Server (NTRS)

    Bailey, Sheila G.; Landis, Geoffrey A.; Wilt, David M.

    1989-01-01

    Results of micron-spaced geometries produced by wet chemical etching and subsequent OMCVD growth on various GaAs surfaces are presented. The polar lattice increases the complexity of the process. The slow-etch planes defined by anisotropic etching are not always the same as the growth facets produced during MOCVD deposition, especially for deposition on higher-order planes produced by the hex groove etching.

  10. Heteroepitaxial growth of 3-5 semiconductor compounds by metal-organic chemical vapor deposition for device applications

    NASA Technical Reports Server (NTRS)

    Collis, Ward J.; Abul-Fadl, Ali

    1988-01-01

    The purpose of this research is to design, install and operate a metal-organic chemical vapor deposition system which is to be used for the epitaxial growth of 3-5 semiconductor binary compounds, and ternary and quaternary alloys. The long-term goal is to utilize this vapor phase deposition in conjunction with existing current controlled liquid phase epitaxy facilities to perform hybrid growth sequences for fabricating integrated optoelectronic devices.

  11. Improved detection and false alarm rejection for chemical vapors using passive hyperspectral imaging

    NASA Astrophysics Data System (ADS)

    Marinelli, William J.; Miyashiro, Rex; Gittins, Christopher M.; Konno, Daisei; Chang, Shing; Farr, Matt; Perkins, Brad

    2013-05-01

    Two AIRIS sensors were tested at Dugway Proving Grounds against chemical agent vapor simulants. The primary objectives of the test were to: 1) assess performance of algorithm improvements designed to reduce false alarm rates with a special emphasis on solar effects, and 3) evaluate performance in target detection at 5 km. The tests included 66 total releases comprising alternating 120 kg glacial acetic acid (GAA) and 60 kg triethyl phosphate (TEP) events. The AIRIS sensors had common algorithms, detection thresholds, and sensor parameters. The sensors used the target set defined for the Joint Service Lightweight Chemical Agent Detector (JSLSCAD) with TEP substituted for GA and GAA substituted for VX. They were exercised at two sites located at either 3 km or 5 km from the release point. Data from the tests will be presented showing that: 1) excellent detection capability was obtained at both ranges with significantly shorter alarm times at 5 km, 2) inter-sensor comparison revealed very comparable performance, 3) false alarm rates < 1 incident per 10 hours running time over 143 hours of sensor operations were achieved, 4) algorithm improvements eliminated both solar and cloud false alarms. The algorithms enabling the improved false alarm rejection will be discussed. The sensor technology has recently been extended to address the problem of detection of liquid and solid chemical agents and toxic industrial chemical on surfaces. The phenomenology and applicability of passive infrared hyperspectral imaging to this problem will be discussed and demonstrated.

  12. Modeling chemical vapor deposition of silicon dioxide in microreactors at atmospheric pressure

    NASA Astrophysics Data System (ADS)

    Konakov, S. A.; Krzhizhanovskaya, V. V.

    2015-01-01

    We developed a multiphysics mathematical model for simulation of silicon dioxide Chemical Vapor Deposition (CVD) from tetraethyl orthosilicate (TEOS) and oxygen mixture in a microreactor at atmospheric pressure. Microfluidics is a promising technology with numerous applications in chemical synthesis due to its high heat and mass transfer efficiency and well-controlled flow parameters. Experimental studies of CVD microreactor technology are slow and expensive. Analytical solution of the governing equations is impossible due to the complexity of intertwined non-linear physical and chemical processes. Computer simulation is the most effective tool for design and optimization of microreactors. Our computational fluid dynamics model employs mass, momentum and energy balance equations for a laminar transient flow of a chemically reacting gas mixture at low Reynolds number. Simulation results show the influence of microreactor configuration and process parameters on SiO2 deposition rate and uniformity. We simulated three microreactors with the central channel diameter of 5, 10, 20 micrometers, varying gas flow rate in the range of 5-100 microliters per hour and temperature in the range of 300-800 °C. For each microchannel diameter we found an optimal set of process parameters providing the best quality of deposited material. The model will be used for optimization of the microreactor configuration and technological parameters to facilitate the experimental stage of this research.

  13. Surface modification of silicon-containing fluorocarbon films prepared by plasma-enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Jin, Yoonyoung; Desta, Yohannes; Goettert, Jost; Lee, G. S.; Ajmera, P. K.

    2005-07-01

    Surface modification of silicon-containing fluorocarbon (SiCF) films achieved by wet chemical treatments and through x-ray irradiation is examined. The SiCF films were prepared by plasma-enhanced chemical vapor deposition, using gas precursors of tetrafluoromethane and disilane. As-deposited SiCF film composition was analyzed by x-ray photoelectron spectroscopy. Surface modification of SiCF films utilizing n-lithiodiaminoethane wet chemical treatment is discussed. Sessile water-drop contact angle changed from 95°+/-2° before treatment to 32°+/-2° after treatment, indicating a change in the film surface characteristics from hydrophobic to hydrophilic. For x-ray irradiation on the SiCF film with a dose of 27.4 kJ/cm3, the contact angle of the sessile water drop changed from 95°+/-2° before radiation to 39°+/-3° after x-ray exposure. The effect of x-ray exposure on chemical bond structure of SiCF films is studied using Fourier transform infrared measurements. Electroless Cu deposition was performed to test the applicability of the surface modified films. The x-ray irradiation method offers a unique advantage in making possible surface modification in a localized area of high-aspect-ratio microstructures. Fabrication of a Ti-membrane x-ray mask is introduced here for selective surface modification using x-ray irradiation.

  14. CHEMICALLY VAPOR DEPOSITED YTTRIA-STABILIZED ZIRCONIA (YSZ) FOR THERMAL AND ENVIRONMENTAL BARRIER COATING

    SciTech Connect

    Varanasi, V.G.; Besmann, T.M.; Lothian, J.L.; Xu, W.; Starr, T.L.

    2003-04-22

    Yttria-stabilized zirconia (YSZ) is used as a thermal barrier coating (TBC) to protect super-alloy blades such as Mar-M247 or Rene-N5 during engine operation. The current method for YSZ fabrication for TBC applications is by air-plasma spraying (APS) or electron beam physical vapor deposition (EB-PVD) (Haynes 1997). APS gives reasonable deposition rates, but has a limited life and aging effects due to its porous and lamellar structure. The EB-PVD coatings are more stable and can accommodate thermomechanical stresses due to their characteristic strain-tolerant, columnar microstructure. EB-PVD, however, is primarily line-of-sight, which often leaves ''hidden areas'' uncoated, has low throughput, and has high capital cost. The process of metal-organic chemical vapor deposition (MOCVD) is investigated here as an economical alternative to EB-PVD and APS, with the potential for better overall coverage as well as the ability to produce thick (100-250 {micro}m), strain-tolerant, columnar coatings. MOCVD of YSZ involves the use of zirconium and yttrium organometallic precursors reacting with an oxygen source. Previous researchers have used diketonate or chloride precursors and oxygen (Wahl et al. 2001a, Wahl et al. 2001b, Yamane and Harai 1989). These precursors have low transport rates due to their low carrier solvent solubility (Varanasi et al. 2003). Solvated zirconium and yttrium butoxide precursors were investigated here due to their higher vapor pressures and high solvent solubility. This work uses predictive equilibrium modeling and experiments involving butoxide precursors for tetragonal YSZ fabrication.

  15. Temperature regulated-chemical vapor deposition for incorporating NiO nanoparticles into mesoporous media

    NASA Astrophysics Data System (ADS)

    Han, Sang Wook; Kim, Il Hee; Kim, Dae Han; Park, Ki Jung; Park, Eun Ji; Jeong, Myung-Geun; Kim, Young Dok

    2016-11-01

    We have developed a novel strategy for incorporating NiO nanoparticles into mesoporous Al2O3 with a mean pore size of ∼12 nm and particle size of ∼1 mm. Ni-precursor vapor and ambient atmosphere were filled in a closed chamber with mesoporous Al2O3, and the chamber was initially heated at ∼100 °C, at which no chemical reaction between the inorganic precursor, oxygen, water vapor in the atmosphere, and the surface of Al2O3 took place. Next, the temperature of the system was increased to 260 °C for deposition of NiO. We found that NiO nanoparticles were not only deposited on the surface, but were also incorporated in a 50 μm-deep region of the mesoporous Al2O3 gel. We also demonstrated high CO oxidation activity and reusability of the deactivated NiO/Al2O3 catalysts prepared by the aforementioned method. These results suggest that our strategy could be widely applicable to the incorporation of various nanoparticles into mesoporous supports.

  16. Design and implementation of a novel portable atomic layer deposition/chemical vapor deposition hybrid reactor

    NASA Astrophysics Data System (ADS)

    Selvaraj, Sathees Kannan; Jursich, Gregory; Takoudis, Christos G.

    2013-09-01

    We report the development of a novel portable atomic layer deposition chemical vapor deposition (ALD/CVD) hybrid reactor setup. Unique feature of this reactor is the use of ALD/CVD mode in a single portable deposition system to fabricate multi-layer thin films over a broad range from "bulk-like" multi-micrometer to nanometer atomic dimensions. The precursor delivery system and control-architecture are designed so that continuous reactant flows for CVD and cyclic pulsating flows for ALD mode are facilitated. A custom-written LabVIEW program controls the valve sequencing to allow synthesis of different kinds of film structures under either ALD or CVD mode or both. The entire reactor setup weighs less than 40 lb and has a relatively small footprint of 8 × 9 in., making it compact and easy for transportation. The reactor is tested in the ALD mode with titanium oxide (TiO2) ALD using tetrakis(diethylamino)titanium and water vapor. The resulting growth rate of 0.04 nm/cycle and purity of the films are in good agreement with literature values. The ALD/CVD hybrid mode is demonstrated with ALD of TiO2 and CVD of tin oxide (SnOx). Transmission electron microscopy images of the resulting films confirm the formation of successive distinct TiO2-ALD and SnOx-CVD layers.

  17. Chemical Vapor Deposition of Fluoroalkylsilane Monolayer Films for Adhesion Control in Microelectromechanical Systems

    SciTech Connect

    MAYER,THOMAS M.; DE BOER,MAARTEN P.; SHINN,NEAL D.; CLEWS,PEGGY J.; MICHALSKE,TERRY A.

    2000-01-26

    We have developed a new process for applying a hydrophobic, low adhesion energy coating to microelectromechanical (MEMS) devices. Monolayer films are synthesized from tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane (FOTS) and water vapor in a low-pressure chemical vapor deposition process at room temperature. Film thickness is self-limiting by virtue of the inability of precursors to stick to the fluorocarbon surface of the film once it has formed. We have measured film densities of {approx}3 molecules nm{sup 2} and film thickness of {approx}1 nm. Films are hydrophobic, with a water contact angle >110{sup o}. We have also incorporated an in-situ downstream microwave plasma cleaning process, which provides a clean, reproducible oxide surface prior to film deposition. Adhesion tests on coated and uncoated MEMS test structures demonstrate superior performance of the FOTS coatings. Cleaned, uncoated cantilever beam structures exhibit high adhesion energies in a high humidity environment. An adhesion energy of 100 mJ m{sup -2} is observed after exposure to >90% relative humidity. Fluoroalkylsilane coated beams exhibit negligible adhesion at low humidity and {<=} 20 {micro}J m{sup -2} adhesion energy at >90% relative humidity. No obvious film degradation was observed for films exposed to >90% relative humidity at room temperature for >24 hr.

  18. Design and implementation of a novel portable atomic layer deposition/chemical vapor deposition hybrid reactor.

    PubMed

    Selvaraj, Sathees Kannan; Jursich, Gregory; Takoudis, Christos G

    2013-09-01

    We report the development of a novel portable atomic layer deposition chemical vapor deposition (ALD/CVD) hybrid reactor setup. Unique feature of this reactor is the use of ALD/CVD mode in a single portable deposition system to fabricate multi-layer thin films over a broad range from "bulk-like" multi-micrometer to nanometer atomic dimensions. The precursor delivery system and control-architecture are designed so that continuous reactant flows for CVD and cyclic pulsating flows for ALD mode are facilitated. A custom-written LabVIEW program controls the valve sequencing to allow synthesis of different kinds of film structures under either ALD or CVD mode or both. The entire reactor setup weighs less than 40 lb and has a relatively small footprint of 8 × 9 in., making it compact and easy for transportation. The reactor is tested in the ALD mode with titanium oxide (TiO2) ALD using tetrakis(diethylamino)titanium and water vapor. The resulting growth rate of 0.04 nm/cycle and purity of the films are in good agreement with literature values. The ALD/CVD hybrid mode is demonstrated with ALD of TiO2 and CVD of tin oxide (SnOx). Transmission electron microscopy images of the resulting films confirm the formation of successive distinct TiO2-ALD and SnO(x)-CVD layers. PMID:24089868

  19. Facile synthesis 3D flexible core-shell graphene/glass fiber via chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Yang, Cheng; Xu, Yuanyuan; Zhang, Chao; Sun, Zhencui; Chen, Chuansong; Li, Xiuhua; Jiang, Shouzhen; Man, Baoyuan

    2014-08-01

    Direct deposition of graphene layers on the flexible glass fiber surface to form the three-dimensional (3D) core-shell structures is offered using a two-heating reactor chemical vapor deposition system. The two-heating reactor is utilized to offer sufficient, well-proportioned floating C atoms and provide a facile way for low-temperature deposition. Graphene layers, which are controlled by changing the growth time, can be grown on the surface of wire-type glass fiber with the diameter from 30 nm to 120 um. The core-shell graphene/glass fiber deposition mechanism is proposed, suggesting that the 3D graphene films can be deposited on any proper wire-type substrates. These results open a facile way for direct and high-efficiency deposition of the transfer-free graphene layers on the low-temperature dielectric wire-type substrates.

  20. Properties of chemical-vapor-deposited silicon carbide for optics applications in severe environments.

    PubMed

    Goela, J S; Pickering, M A; Taylor, R L; Murray, B W; Lompado, A

    1991-08-01

    Important data on chemical-vapor-deposited (CVD) SiC concerning the elastic modulus, polishability, scattering measurement, thermal and cryogenic stability, and degradation owing to the effects of atomic oxygen and electron beams have been obtained with the aim of assessing the suitability of SiC as an optical substrate for severe environments. These measurements show that CVD SiC substrates exhibit excellent polishability (<0.1 nm rms) with low scatter, good retention of mechanical properties up to 1500 degrees C, superior thermal and cryogenic stability (-190 degrees to 1350 degrees C) and high resistance to atomic-oxygen and electron-beam degradation. These results suggest that CVD SiC optical substrates will perform extremely well in severe environments such as outer space, and when used in lasers, combustion, and synchrotron x rays. PMID:20706370

  1. Size effect of large deformable nanopillar by focused-ion-beam chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Tanaka, H.; Shinkai, M.; Shibutani, Y.; Kogo, Y.

    2009-11-01

    Nanoscopic fabrication technique has been achieved by the direct deposition methods using focused-ion-beam chemical vapor deposition (FIB-CVD). The nanopillar fabricated by FIB-CVD consists of an outer amorphous carbon ring and a inner gallium core. We developed the original double-cantilever (DC) bending test using two pillars rigidly connected by the exposure of a focused electron beam in a scanning electron microscope. The obtained deflection curves suggest that nanopillars have the size dependence to the mechanical response. The pillar with the diameter over 180 nm exhibits a wide region of stiffness weakening after linear response and then becomes extremely hardened at a large deflection. Thus, the pillar intrinsically possesses much more flexibility for bending without any fracturing. The accuracy of a DC testing is also discussed by estimating the bending rigidities of nanopillars, comparing to those obtained by resonance frequency tests.

  2. Direct Chemical Vapor Deposition-Derived Graphene Glasses Targeting Wide Ranged Applications.

    PubMed

    Sun, Jingyu; Chen, Yubin; Priydarshi, Manish Kr; Chen, Zhang; Bachmatiuk, Alicja; Zou, Zhiyu; Chen, Zhaolong; Song, Xiuju; Gao, Yanfeng; Rümmeli, Mark H; Zhang, Yanfeng; Liu, Zhongfan

    2015-09-01

    Direct growth of graphene on traditional glasses is of great importance for various daily life applications. We report herein the catalyst-free atmospheric-pressure chemical vapor deposition approach to directly synthesizing large-area, uniform graphene films on solid glasses. The optical transparency and sheet resistance of such kinds of graphene glasses can be readily adjusted together with the experimentally tunable layer thickness of graphene. More significantly, these graphene glasses find a broad range of real applications by enabling the low-cost construction of heating devices, transparent electrodes, photocatalytic plates, and smart windows. With a practical scalability, the present work will stimulate various applications of transparent, electrically and thermally conductive graphene glasses in real-life scenarios. PMID:26305883

  3. Nanoscale arrays of antimony telluride single crystals by selective chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Huang, Ruomeng; Benjamin, Sophie L.; Gurnani, Chitra; Wang, Yudong; Hector, Andrew L.; Levason, William; Reid, Gillian; de Groot, C. H. (Kees)

    2016-06-01

    Arrays of individual single nanocrystals of Sb2Te3 have been formed using selective chemical vapor deposition (CVD) from a single source precursor. Crystals are self-assembled reproducibly in confined spaces of 100 nm diameter with pitch down to 500 nm. The distribution of crystallite sizes across the arrays is very narrow (standard deviation of 15%) and is affected by both the hole diameter and the array pitch. The preferred growth of the crystals in the <1 1 0> orientation along the diagonal of the square holes strongly indicates that the diffusion of adatoms results in a near thermodynamic equilibrium growth mechanism of the nuclei. A clear relationship between electrical resistivity and selectivity is established across a range of metal selenides and tellurides, showing that conductive materials result in more selective growth and suggesting that electron donation is of critical importance for selective deposition.

  4. Reducing flicker noise in chemical vapor deposition graphene field-effect transistors

    NASA Astrophysics Data System (ADS)

    Arnold, Heather N.; Sangwan, Vinod K.; Schmucker, Scott W.; Cress, Cory D.; Luck, Kyle A.; Friedman, Adam L.; Robinson, Jeremy T.; Marks, Tobin J.; Hersam, Mark C.

    2016-02-01

    Single-layer graphene derived from chemical vapor deposition (CVD) holds promise for scalable radio frequency (RF) electronic applications. However, prevalent low-frequency flicker noise (1/f noise) in CVD graphene field-effect transistors is often up-converted to higher frequencies, thus limiting RF device performance. Here, we achieve an order of magnitude reduction in 1/f noise in field-effect transistors based on CVD graphene transferred onto silicon oxide substrates by utilizing a processing protocol that avoids aqueous chemistry after graphene transfer. Correspondingly, the normalized noise spectral density (10-7-10-8 μm2 Hz-1) and noise amplitude (4 × 10-8-10-7) in these devices are comparable to those of exfoliated and suspended graphene. We attribute the reduction in 1/f noise to a decrease in the contribution of fluctuations in the scattering cross-sections of carriers arising from dynamic redistribution of interfacial disorder.

  5. Chemical Vapor Deposition of Silicon Carbide Epitaxial Films and their Characterization

    SciTech Connect

    Dhanaraj,G.; Chen, Y.; Dudley, M.; Cai, D.; Zhang, H.

    2007-01-01

    A chemical vapor deposition (CVD) system was designed and fabricated in our laboratory and SiC homo-epitaxial layers were grown in the CVD process using silicon tetrachloride and propane precursors with hydrogen as a carrier gas. The temperature field was generated using numerical modeling. Gas flow rates, temperature field, and the gradients are found to influence the growth rates of the epitaxial layers. Growth rates were found to increase as the temperature increased at high carrier gas flow rate, while at lower carrier gas flow rate, growth rates were observed to decrease as the temperature increased. Based on the equilibrium model, 'thermodynamically controlled growth' accounts for the growth rate reduction. The grown epitaxial layers were characterized using various techniques. Reduction in the threading screw dislocation (SD) density in the epilayers was observed. Suitable models were developed for explaining the reduction in the SD density as well as the conversion of basal plane dislocations (BPDs) into threading edge dislocations (TEDs).

  6. Metal-organic chemical vapor deposition of aluminum oxide thin films via pyrolysis of dimethylaluminum isopropoxide

    SciTech Connect

    Schmidt, Benjamin W.; Sweet, William J. III; Rogers, Bridget R.; Bierschenk, Eric J.; Gren, Cameron K.; Hanusa, Timothy P.

    2010-03-15

    Metal-organic chemical vapor deposited aluminum oxide films were produced via pyrolysis of dimethylaluminum isopropoxide in a high vacuum reaction chamber in the 417-659 deg. C temperature range. Deposited films contained aluminum, oxygen, and carbon, and the carbon-to-aluminum ratio increased with increased deposition temperature. Aluminum-carbon bonding was observed in films deposited at 659 deg. C by x-ray photoelectron spectroscopy, but not in films deposited at 417 deg. C. The apparent activation energy in the surface reaction controlled regime was 91 kJ/mol. The O/Al and C/Al ratios in the deposited films were greater and less than, respectively, the ratios predicted by the stoichiometry of the precursor. Flux analysis of the deposition process suggested that the observed film stoichiometries could be explained by the participation of oxygen-containing background gases present in the reactor at its base pressure.

  7. Growth of GaN micro/nanolaser arrays by chemical vapor deposition.

    PubMed

    Liu, Haitao; Zhang, Hanlu; Dong, Lin; Zhang, Yingjiu; Pan, Caofeng

    2016-09-01

    Optically pumped ultraviolet lasing at room temperature based on GaN microwire arrays with Fabry-Perot cavities is demonstrated. GaN microwires have been grown perpendicularly on c-GaN/sapphire substrates through simple catalyst-free chemical vapor deposition. The GaN microwires are [0001] oriented single-crystal structures with hexagonal cross sections, each with a diameter of ∼1 μm and a length of ∼15 μm. A possible growth mechanism of the vertical GaN microwire arrays is proposed. Furthermore, we report room-temperature lasing in optically pumped GaN microwire arrays based on the Fabry-Perot cavity. Photoluminescence spectra exhibit lasing typically at 372 nm with an excitation threshold of 410 kW cm(-2). The result indicates that these aligned GaN microwire arrays may offer promising prospects for ultraviolet-emitting micro/nanodevices. PMID:27454350

  8. Chemical vapor deposition of Ta{sub 2}O{sub 5} corrosion resistant coatings

    SciTech Connect

    Graham, D.W.; Stinton, D.P.

    1992-12-31

    Silicon carbide and silicon nitride heat engine components are susceptible to hot corrosion by molten Na{sub 2}SO{sub 4} which forms from impurities present in fuel and the environment. Chemically vapor deposited Ta{sub 2}O{sub 5} coatings are being developed as a means to protect components from reaction with these salts and preserve their structural properties. Investigations to optimize the structure of the coating have revealed that the deposition conditions dramatically affect the coating morphology. Coatings deposited at high temperatures are typically columnar in structure; high concentrations of the reactant gases produce oxide powders on the substrate surface. Ta{sub 2}O{sub 5} deposited at low temperatures consists of grains that are finer and have significantly less porosity than that formed at high temperatures. Samples of coatings which have been produced by CVD have successfully completed preliminary testing for resistance to corrosion by Na{sub 2}SO{sub 4}.

  9. Photoluminescence of Ag-doped ZnSe nanowires synthesized by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Zhang, X. T.; Ip, K. M.; Li, Quan; Hark, S. K.

    2005-05-01

    Photoluminescence of Ag-doped ZnSe nanowires synthesized by metalorganic chemical vapor deposition is investigated in the temperature range from 10to300K. Ag impurities were introduced into the ZnSe nanowires during the growing process. Some dominating Ag-related centers are found. Especially, the strong zero-phonon bound exciton luminescence with energy near 2.747eV is attributed to a neutral AgZn acceptor complex. This is because the emission peak at the same energy is observed only in the photoluminescence spectrum of the Ag-doped bulk ZnSe. A new luminescence peak at 2.842eV is attributed to the recombination of excitons bound to ionized acceptors (I2h) in the hexagonal phase of ZnSe nanowires. The physical origins of the emissions are briefly discussed.

  10. Growth mechanism of graphene on graphene films grown by chemical vapor deposition.

    PubMed

    Kang, Cheong; Jung, Da Hee; Lee, Jin Seok

    2015-03-01

    We report an approach for the synthesis of mono- or bilayer graphene films by atmospheric-pressure chemical vapor deposition that can achieve a low defect density through control over the growth time. Different heating ramp rates were found to lead to variation in the smoothness and grain size of the Cu foil substrate, which directly influenced the density of the graphene domains. The rough Cu surface induced by rapid heating creates a high density of graphene domains in the initial stage, ultimately resulting in a graphene film with a high defect density due to an increased overlap between domains. Conversely, a slow heating rate resulted in a smooth and flat Cu surface, thereby lowering the density of the initial graphene domains and ensuring a uniform monolayer film. From this, we demonstrate that the growth mechanism of graphene on existing graphene films is dependent on the density of the initial graphene domains, which is affected by the heating ramp rate. PMID:25655906

  11. Continuous fabrication of silicon carbide fiber tows by chemical vapor deposition

    SciTech Connect

    Lackey, W.J.; Hanigofsky, J.A.; Freeman, G.B.; Hardin, R.D.; Prasad, A.

    1995-06-01

    The feasibility of preparing small-diameter, high-strength thermally stable silicon carbide fiber tows by the continuous chemical vapor deposition (CVD) of SiC onto carbon fiber tows was experimentally evaluated. Calculations of bending stresses and stresses caused by thermal expansion mismatch between the substrate and coating were used to evaluate the influence of coating thickness and substrate fiber diameter and type. Statistically designed and analyzed processing studies quantitatively showed the influence of key CVD process variables (temperature, pressure, and flow rates of CH{sub 3}SiCl{sub 3} and H{sub 2}) on fiber attributes such as coating thickness and uniformity, surface roughness, percent agglomeration, and strength. Emphasis was given to conceiving and evaluating various fiber spreading devices in order to enhance coating uniformity and to minimize filament agglomeration within a two. Uniform coatings and fiber tensile strengths as high as 4 GPa were achieved.

  12. Growth of well-oriented VACNTs using thermal chemical vapor deposition method

    NASA Astrophysics Data System (ADS)

    Yousefi, Amin Termeh; Mahmood, Mohamad Rusop; Ikeda, Shoichiro

    2016-07-01

    The remarkable properties of carbon nanotubes (CNTs) make them attractive for biosensor applications, especially for medical detecting devices. In this paper, we describe a process to grow high oriented ratio CNT arrays to improve the electrical properties of the devices based on CNTs. Chemical vapor deposition (CVD) was used to grow highly oriented CNT using camphor as the carbon source, and argon and hydrogen as carrier gases to grow perpendicular CNTs on the surface of the silicon substrate in presence of ferrocene as a metallic catalyst. Images were revealed by FESEM indicates that the formation mechanism of oriented CNTs with high morphological purity nanotubes, which is depends significantly on deposition time and applied temperature to the furnaces. This method might be an effective method to produce oriented MWCNT in different length.

  13. Boron nitride nanowires synthesis via a simple chemical vapor deposition at 1200 °C

    SciTech Connect

    Ahmad, Pervaiz; Khandaker, Mayeen Uddin; Amin, Yusoff Mohd; Khan, Ziaul Raza

    2015-04-24

    A very simple chemical vapor deposition technique is used to synthesize high quality boron nitride nanowires at 1200 °C within a short growth duration of 30 min. FESEM micrograph shows that the as-synthesized boron nitride nanowires have a clear wire like morphology with diameter in the range of ∼20 to 150 nm. HR-TEM confirmed the wire-like structure of boron nitride nanowires, whereas XPS and Raman spectroscopy are used to find out the elemental composition and phase of the synthesized material. The synthesized boron nitride nanowires have potential applications as a sensing element in solid state neutron detector, neutron capture therapy and microelectronic devices with uniform electronic properties.

  14. Development of a polysilicon process based on chemical vapor deposition, phase 1

    NASA Technical Reports Server (NTRS)

    Mccormick, J.; Sharp, K.; Arvidson, A.; Sawyer, D.

    1981-01-01

    The development of a dichlorosilane-based reductive chemical vapor deposition process for the production of polycrystalline silicon is discussed. Experimental data indicate that the ease of ignition and explosion severity of dichlorosilane (DCS)/air mixtures is substantially attenuated if the DCS is diluted with hydrogen. Redesign of the process development unit to accommodate safety related information is described. Several different sources of trichlorosilane were used to generate a mixture of redistributed chlorosilanes via Dowex ion exchange resin. The unseparated mixtures were then fed to an experimental reactor in which silicon was deposited and the deposited silicon analyzed for electrically active impurities. At least one trichlorosilane source provided material of requisite purity. Silicon grown in the experimental reactor was converted to single crystal material and solar cells fabricated and tested.

  15. Wet Etching of Heat Treated Atomic Layer Chemical Vapor Deposited Zirconium Oxide in HF Based Solutions

    NASA Astrophysics Data System (ADS)

    Balasubramanian, Sriram; Raghavan, Srini

    2008-06-01

    Alternative materials are being considered to replace silicon dioxide as gate dielectric material. Of these, the oxides of hafnium and zirconium show the most promise. However, integrating these new high-k materials into the existing complementary metal-oxide-semiconductor (CMOS) process remains a challenge. One particular area of concern is the wet etching of heat treated high-k dielectrics. In this paper, work done on the wet etching of heat treated atomic layer chemical vapor deposited (ALCVD) zirconium oxide in HF based solutions is presented. It was found that heat treated material, while refractory to wet etching at room temperature, is more amenable to etching at higher temperatures when methane sulfonic acid is added to dilute HF solutions. Selectivity over SiO2 is still a concern.

  16. Superconducting magnesium diboride coatings for radio frequency cavities fabricated by hybrid physical-chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Wolak, M. A.; Tan, T.; Krick, A.; Johnson, E.; Hambe, M.; Chen, Ke; Xi, X. X.

    2014-01-01

    We have investigated the coating of an inner surface of superconducting radio frequency cavities with a magnesium diboride thin film by hybrid physical-chemical vapor deposition (HPCVD). To simulate a 6 GHz rf cavity, a straight stainless steel tube of 1.5-inch inner diameter and a dummy stainless steel cavity were employed, on which small sapphire and metal substrates were mounted at different locations. The MgB2 films on these substrates showed uniformly good superconducting properties including Tc of 37-40 K, residual resistivity ratio of up to 14, and root-mean-square roughness Rq of 20-30 nm. This work demonstrates the feasibility of coating the interior of cylindrical and curved objects with MgB2 by the HPCVD technique, an important step towards superconducting rf cavities with MgB2 coating.

  17. Fabrication of conformal ZnS domes by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Goela, Jitendra S.; Askinazi, Joel

    1999-07-01

    Aspheric shape ZnS domes were fabricated by a scalable and cost-effective chemical vapor deposition (CVD) process to demonstrate the feasibility of producing aerodynamic domes that conform to the shape of the missile body. These domes provide enhanced performance by substantially reducing the missile drag, although they also present issues of CVD deposition, optical fabrication to the required figure and finish, particularly the inside surface, and metrology. Domes were fabricated on 'male' mandrels in a CVD chamber to produce net-shape or precision replicated inside surface and then diamond turned to produce surfaces with figure of a fraction of a wave and finish of 180 angstrom RMS. Important issues involved in near-net-shaping and precision replication of ZnS domes are discussed and data on mandrel and release coating materials, degree of replication achieved and mandrel durability are presented.

  18. The response of the ionosphere to the injection of chemically reactive vapors

    NASA Technical Reports Server (NTRS)

    Bernhardt, P. A.

    1976-01-01

    As a gas released in the ionosphere expands, it is rapidly cooled. When the vapor becomes sufficiently tenuous, it is reheated by collisions with the ambient atmosphere and its flow is then governed by diffusive expansion. As the injected gas becomes well mixed with the plasma, a hole is created by chemical processes. In the case of diatomic hydrogen release, depression of the electron concentrations is governed by the charge exchange reaction between oxygen ions and hydrogen, producing positive hydroxyl ions. Hydroxyl ions rapidly react with the electron gas to produce excited oxygen and hydrogen atoms. Enhanced airglow emissions result from the transition of the excited atoms to lower energy states. The electron temperature in the depleted region rises sharply causing a thermal expansion of the plasma and a further reduction in the local plasma concentration.

  19. Development of a polysilicon process based on chemical vapor deposition (phase 1)

    NASA Technical Reports Server (NTRS)

    Mccormick, J.; Arvidson, A.; Sawyer, D.; Plahutnik, F.

    1981-01-01

    A dichlorosilane-based reductive chemical vapor deposition (CVD) process demonstrated is capable of producing, at low cost, high quality polycrystalline silicon. Testing of decomposition reactor heat shields to insure that the shield provides adequate personnel protection assuming a worst case explosion was completed. Minor modifications to a production reactor heat shield provided adequate heat shield integrity. Construction of the redesigned PDU (Process Development Unit) to accommodate all safety related information proceeded on schedule. Structural steel work was completed as is the piping and instrumentation design work. Major pieces of process equipment were received and positioned in the support structure and all transfer piping and conduits to the PDU were installed. Construction was completed on a feed system for supplying DCS to an intermediate sized reactor. The feed system was successfully interfaced with a reactor equipped with a modified heat shield. Reactor checkout was completed.

  20. Plasma-enhanced chemical vapor deposition of amorphous Si on graphene

    NASA Astrophysics Data System (ADS)

    Lupina, G.; Strobel, C.; Dabrowski, J.; Lippert, G.; Kitzmann, J.; Krause, H. M.; Wenger, Ch.; Lukosius, M.; Wolff, A.; Albert, M.; Bartha, J. W.

    2016-05-01

    Plasma-enhanced chemical vapor deposition of thin a-Si:H layers on transferred large area graphene is investigated. Radio frequency (RF, 13.56 MHz) and very high frequency (VHF, 140 MHz) plasma processes are compared. Both methods provide conformal coating of graphene with Si layers as thin as 20 nm without any additional seed layer. The RF plasma process results in amorphization of the graphene layer. In contrast, the VHF process keeps the high crystalline quality of the graphene layer almost intact. Correlation analysis of Raman 2D and G band positions indicates that Si deposition induces reduction of the initial doping in graphene and an increase of compressive strain. Upon rapid thermal annealing, the amorphous Si layer undergoes dehydrogenation and transformation into a polycrystalline film, whereby a high crystalline quality of graphene is preserved.

  1. Low-temperature synthesis of graphene on nickel foil by microwave plasma chemical vapor deposition.

    PubMed

    Kim, Y; Song, W; Lee, S Y; Jeon, C; Jung, W; Kim, M; Park, C-Y

    2011-06-27

    Microwave plasma chemical vapor deposition (MPCVD) was employed to synthesize high quality centimeter scale graphene film at low temperatures. Monolayer graphene was obtained by varying the gas mixing ratio of hydrogen and methane to 80:1. Using advantages of MPCVD, the synthesis temperature was decreased from 750 °C down to 450 °C. Optical microscopy and Raman mapping images exhibited that a large area monolayer graphene was synthesized regardless of the temperatures. Since the overall transparency of 89% and low sheet resistances ranging from 590 to 1855 Ω∕sq of graphene films were achieved at considerably low synthesis temperatures, MPCVD can be adopted in manufacturing future large-area electronic devices based on graphene film. PMID:21799537

  2. Low-temperature synthesis of graphene on nickel foil by microwave plasma chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Kim, Y.; Song, W.; Lee, S. Y.; Jeon, C.; Jung, W.; Kim, M.; Park, C.-Y.

    2011-06-01

    Microwave plasma chemical vapor deposition (MPCVD) was employed to synthesize high quality centimeter scale graphene film at low temperatures. Monolayer graphene was obtained by varying the gas mixing ratio of hydrogen and methane to 80:1. Using advantages of MPCVD, the synthesis temperature was decreased from 750 °C down to 450 °C. Optical microscopy and Raman mapping images exhibited that a large area monolayer graphene was synthesized regardless of the temperatures. Since the overall transparency of 89% and low sheet resistances ranging from 590 to 1855 Ω/sq of graphene films were achieved at considerably low synthesis temperatures, MPCVD can be adopted in manufacturing future large-area electronic devices based on graphene film.

  3. Carbon impurities on graphene synthesized by chemical vapor deposition on platinum

    SciTech Connect

    Ping, Jinglei; Fuhrer, Michael S.

    2014-07-28

    We report nanocrystalline carbon impurities coexisting with graphene synthesized via chemical vapor deposition on platinum. For certain growth conditions, we observe micron-size island-like impurity layers which can be mistaken for second graphene layers in optical microscopy or scanning electron microscopy. The island orientation depends on the crystalline orientation of the Pt, as shown by electron backscatter diffraction, indicating growth of carbon at the platinum surface below graphene. Dark-field transmission electron microscopy indicates that in addition to uniform single-crystal graphene, our sample is decorated with nanocrystalline carbon impurities with a spatially inhomogeneous distribution. The impurity concentration can be reduced significantly by lowering the growth temperature. Raman spectra show a large D peak, however, electrical characterization shows high mobility (∼8000 cm{sup 2}/Vs), indicating a limitation for Raman spectroscopy in characterizing the electronic quality of graphene.

  4. Investigation of Ru/TiN Bottom Electrodes Prepared by Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Kang, Sang Yeol; Kim, Beom Seok; Hwang, Cheol Seong; Kim, Hyeong Joon; Kim, Jin Yong; Lee, Kwanghee; Lim, Han-Jin; Yoo, Cha-Young; Kim, Sung-Tae

    2004-09-01

    Ru thin films were prepared by metalorganic chemical vapor deposition (MOCVD) using cyclopentadienyl-propylcyclopentadienlylruthenium(II) [RuCp(i-PrCp)] and the nucleation behaviors of Ru films on Ta2O5, TiN, Si3N4, SiO2, TiO2 substrates were investigated. It appeared that the difference in nucleation behaviors on various substrates is due to the bonding type between atoms in substrate materials. The nucleation property of Ru films on TiN was successfully improved by plasma treatment of the TiN substrate using Ar before film deposition. It was found that the Ar plasma treatment selectively removes N ions from the surface, makes the TiN surface more metallic or ionic (due to the residual Ti-O bonding), and reduces the nucleation barrier. In addition, the oxidation resistance of Ru/TiN layers was improved by H2 annealing, which made the Ru films more dense.

  5. Uniformity of large-area bilayer graphene grown by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Sheng, Yuewen; Rong, Youmin; He, Zhengyu; Fan, Ye; Warner, Jamie H.

    2015-10-01

    Graphene grown by chemical vapor deposition (CVD) on copper foils is a viable method for large area films for transparent conducting electrode (TCE) applications. We examine the spatial uniformity of large area films on the centimeter scale when transferred onto both Si substrates with 300 nm oxide and flexible transparent polyethylene terephthalate substrates. A difference in the quality of graphene, as measured by the sheet resistance and transparency, is found for the areas at the edges of large sheets that depends on the supporting boat used for the CVD growth. Bilayer graphene is grown with uniform properties on the centimeter scale when a flat support is used for CVD growth. The flat support provides consistent delivery of precursor to the copper catalyst for graphene growth. These results provide important insights into the upscaling of CVD methods for growing high quality graphene and its transfer onto flexible substrates for potential applications as a TCE.

  6. Environmental effects on the tensile strength of chemically vapor deposited silicon carbide fibers

    NASA Technical Reports Server (NTRS)

    Bhatt, R. T.; Kraitchman, M. D.

    1985-01-01

    The room temperature and elevated temperature tensile strengths of commercially available chemically vapor-deposited (CVD) silicon carbide fibers were measured after 15 min heat treatment to 1600 C in various environments. These environments included oxygen, air, argon and nitrogen at one atmosphere and vacuum at 10/9 atmosphere. Two types of fibers were examined which differed in the SiC content of their carbon-rich coatings. Threshold temperature for fiber strength degradation was observed to be dependent on the as-received fiber-flaw structure, on the environment and on the coating. Fractographic analyses and flexural strength measurements indicate that tensile strength losses were caused by surface degradation. Oxidation of the surface coating is suggested as one possible degradation mechanism. The SiC fibers containing the higher percentage of SiC near the surface of the carbon-rich coating show better strength retention and higher elevated temperature strength.

  7. Life cycle cost study for coated conductor manufacture by metal organic chemical vapor deposition

    SciTech Connect

    Chapman, J.N.

    1999-07-13

    The purpose of this report is to calculate the cost of producing high temperature superconducting wire by the Metal Organic Chemical Vapor Deposition (MOCVD) process. The technology status is reviewed from the literature and a plant conceptual design is assumed for the cost calculation. The critical issues discussed are the high cost of the metal organic precursors, the material utilization efficiency and the capability of the final product as measured by the critical current density achieved. Capital, operating and material costs are estimated and summed as the basis for calculating the cost per unit length of wire. Sensitivity analyses of key assumptions are examined to determine their effects on the final wire cost. Additionally, the cost of wire on the basis of cost per kiloampere per meter is calculated for operation at lower temperatures than the liquid nitrogen boiling temperature. It is concluded that this process should not be ruled out on the basis of high cost of precursors alone.

  8. Preparation of dilute magnetic semiconductor films by metalorganic chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Nouhi, Akbar (Inventor); Stirn, Richard J. (Inventor)

    1990-01-01

    A method for preparation of a dilute magnetic semiconductor (DMS) film is provided, wherein a Group II metal source, a Group VI metal source and a transition metal magnetic ion source are pyrolyzed in the reactor of a metalorganic chemical vapor deposition (MOCVD) system by contact with a heated substrate. As an example, the preparation of films of Cd.sub.1-x Mn.sub.x Te, wherein 0.ltoreq..times..ltoreq.0.7, on suitable substrates (e.g., GaAs) is described. As a source of manganese, tricarbonyl (methylcyclopentadienyl) maganese (TCPMn) is employed. To prevent TCPMn condensation during the introduction thereof int the reactor, the gas lines, valves and reactor tubes are heated. A thin-film solar cell of n-i-p structure, wherein the i-type layer comprises a DMS, is also described; the i-type layer is suitably prepared by MOCVD.

  9. Low-temperature synthesis of graphene on nickel foil by microwave plasma chemical vapor deposition

    SciTech Connect

    Kim, Y.; Song, W.; Lee, S. Y.; Jeon, C.; Jung, W.; Kim, M.; Park, C.-Y.

    2011-06-27

    Microwave plasma chemical vapor deposition (MPCVD) was employed to synthesize high quality centimeter scale graphene film at low temperatures. Monolayer graphene was obtained by varying the gas mixing ratio of hydrogen and methane to 80:1. Using advantages of MPCVD, the synthesis temperature was decreased from 750 deg. C down to 450 deg. C. Optical microscopy and Raman mapping images exhibited that a large area monolayer graphene was synthesized regardless of the temperatures. Since the overall transparency of 89% and low sheet resistances ranging from 590 to 1855 {Omega}/sq of graphene films were achieved at considerably low synthesis temperatures, MPCVD can be adopted in manufacturing future large-area electronic devices based on graphene film.

  10. Unintentional Doping Mechanisms in GaAs/Si Films Grown by Metalorganic Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Wang, Jun; Deng, Can; Jia, Zhi-Gang; Wang, Yi-Fan; Wang, Qi; Huang, Yong-Qing; Ren, Xiao-Min

    2013-11-01

    To explain different doping effects in a buffer layer, thermally annealed interface, and upper epilayers of GaAs/Si films grown by Metalorganic Chemical Vapor Deposition (MOCVD), the behaviors of unintentional doping in GaAs/Si films are investigated in detail. A third doping mechanism of arsine impurity incorporation during the growth process of GaAs/Si films, apart from conventional mechanisms of gas phase reaction and diffusion from the silicon substrate, is proposed. The experimental results reveal that the doping behavior in the buffer layer studied is determined by the three types of doping mechanisms together. However in the thermally annealed interface and upper epilayers, the third doping mechanism is dominant. According to the third mechanism, the background carrier concentration in GaAs/Si films grown by MOCVD could be properly controlled through the arsine flow rate.

  11. A model for the growth of cdte by metal organic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Nemirovsky, Y.; Goren, D.; Ruzin, A.

    1991-10-01

    A kinetic model for the metalorganic chemical vapor deposition (MOCVD) growth of CdTe over a wide temperature range is presented. The model yields the growth rate as a function of the gas-phase concentrations of the constituents. The model is corroborated with experimental results obtained by the MOCVD growth of CdTe at 380° C. The major features of the model are the observed two-step surface-controlled pyrolysis and surface saturation, leading initially to a growth rate that increases with the square root of the concentrations of the reacting species and subsequently to a decrease of the growth rate as the concentrations increase. At even higher concentrations, an additional increase of growth rate is observed and modeled.

  12. Growth of GaN micro/nanolaser arrays by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Liu, Haitao; Zhang, Hanlu; Dong, Lin; Zhang, Yingjiu; Pan, Caofeng

    2016-09-01

    Optically pumped ultraviolet lasing at room temperature based on GaN microwire arrays with Fabry–Perot cavities is demonstrated. GaN microwires have been grown perpendicularly on c-GaN/sapphire substrates through simple catalyst-free chemical vapor deposition. The GaN microwires are [0001] oriented single-crystal structures with hexagonal cross sections, each with a diameter of ∼1 μm and a length of ∼15 μm. A possible growth mechanism of the vertical GaN microwire arrays is proposed. Furthermore, we report room-temperature lasing in optically pumped GaN microwire arrays based on the Fabry–Perot cavity. Photoluminescence spectra exhibit lasing typically at 372 nm with an excitation threshold of 410 kW cm‑2. The result indicates that these aligned GaN microwire arrays may offer promising prospects for ultraviolet-emitting micro/nanodevices.

  13. Controlling nucleation of monolayer WSe2 during metal-organic chemical vapor deposition growth

    NASA Astrophysics Data System (ADS)

    Eichfeld, Sarah M.; Oliveros Colon, Víctor; Nie, Yifan; Cho, Kyeongjae; Robinson, Joshua A.

    2016-06-01

    Tungsten diselenide (WSe2) is a semiconducting, two-dimensional (2D) material that has gained interest in the device community recently due to its electronic properties. The synthesis of atomically thin WSe2, however, is still in its infancy. In this work we elucidate the requirements for large selenium/tungsten precursor ratios and explain the effect of nucleation temperature on the synthesis of WSe2 via metal-organic chemical vapor deposition (MOCVD). The introduction of a nucleation-step prior to growth demonstrates that increasing nucleation temperature leads to a transition from a Volmer–Weber to Frank–van der Merwe growth mode. Additionally, the nucleation step prior to growth leads to an improvement of WSe2 layer coverage on the substrate. Finally, we note that the development of this two-step technique may allow for improved control and quality of 2D layers grown via CVD and MOCVD processes.

  14. Growth of cubic boron nitride on diamond particles by microwave plasma enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Saitoh, H.; Yarbrough, W. A.

    1991-06-01

    The nucleation and growth of cubic boron nitride (c-BN) onto diamond powder using solid NaBH4 in low pressure gas mixtures of NH3 and H2 by microwave plasma enhanced chemical vapor deposition has been studied. Boron nitride was deposited on submicron diamond seed crystals scattered on (100) silicon single crystal wafers and evidence was found for the formation of the cubic phase. Diamond powder surfaces appear to preferentially nucleate c-BN. In addition, it was found that the ratio of c-BN to turbostratic structure boron nitride (t-BN) deposited increases with decreasing NH3 concentration in H2. It is suggested that this may be due to an increased etching rate for t-BN by atomic hydrogen whose partial pressure may vary with NH3 concentration.

  15. Spiral Growth of Few-Layer MoS2 by Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Dong, Xi; Tomer, Dushyant; Li, Lian

    Monolayer and few-layer transition metal dichalcogenide MoS2 are grown by chemical vapor deposition on SiO2/Si substrates using MoO3 and S powder as precursors. Before growth, the substrates are pretreated with perylene-3, 4, 9, 10-tetracarboxylic acid tetrapotassium salt to promote nucleation. Monolayer MoS2 islands are triangularly shaped with sizes ranging from a few to tens of micrometers, which also exhibits the characteristic Raman bands at 403.36 and 385.05 cm-1 corresponding to the A1g and E2g modes, respectively. Atomic force microscopy imaging further confirms the monolayer thickness to be 0.8 nm. For few-layer MoS2 films, triangular spirals are observed with both left- and right-handed chirality. Raman spectra showed interesting features of these growth spirals, the details of which will be presented at the meeting. NSF DMR-1508560.

  16. Nanoscale arrays of antimony telluride single crystals by selective chemical vapor deposition

    PubMed Central

    Huang, Ruomeng; Benjamin, Sophie L.; Gurnani, Chitra; Wang, Yudong; Hector, Andrew L.; Levason, William; Reid, Gillian; De Groot, C. H. (Kees)

    2016-01-01

    Arrays of individual single nanocrystals of Sb2Te3 have been formed using selective chemical vapor deposition (CVD) from a single source precursor. Crystals are self-assembled reproducibly in confined spaces of 100 nm diameter with pitch down to 500 nm. The distribution of crystallite sizes across the arrays is very narrow (standard deviation of 15%) and is affected by both the hole diameter and the array pitch. The preferred growth of the crystals in the <1 1 0> orientation along the diagonal of the square holes strongly indicates that the diffusion of adatoms results in a near thermodynamic equilibrium growth mechanism of the nuclei. A clear relationship between electrical resistivity and selectivity is established across a range of metal selenides and tellurides, showing that conductive materials result in more selective growth and suggesting that electron donation is of critical importance for selective deposition. PMID:27283116

  17. Lateral epitaxial overgowth of GaAs by organometallic chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Gale, R. P.; Mcclelland, R. W.; Fan, J. C. C.; Bozler, C. O.

    1982-01-01

    Lateral epitaxial overgrowth of GaAs by organometallic chemical vapor deposition has been demonstrated. Pyrolytic decomposition of trimethylgallium and arsine, without the use of HCl, was used to deposit GaAs on substrates prepared by coating (110) GaAs wafers with SiO2, then using photolithography to open narrow stripes in the oxide. Lateral overgrowth was seeded by epitaxial deposits formed on the GaAs surfaces exposed by the stripe openings. The extent of lateral overgrowth was investigated as a function of stripe orientation and growth temperature. Ratios of lateral to vertical growth rates greater than five have been obtained. The lateral growth is due to surface-kinetic control for the two-dimensional growth geometry studied. A continuous epitaxial GaAs layer 3 microns thick has been grown over a patterned mask on a GaAs substrate and then cleaved from the substrate.

  18. Selective charge doping of chemical vapor deposition-grown graphene by interface modification

    SciTech Connect

    Wang, Shengnan Suzuki, Satoru; Furukawa, Kazuaki; Orofeo, Carlo M.; Takamura, Makoto; Hibino, Hiroki

    2013-12-16

    The doping and scattering effect of substrate on the electronic properties of chemical vapor deposition (CVD)-grown graphene are revealed. Wet etching the underlying SiO{sub 2} of graphene and depositing self-assembled monolayers (SAMs) of organosilane between graphene and SiO{sub 2} are used to modify various substrates for CVD graphene transistors. Comparing with the bare SiO{sub 2} substrate, the carrier mobility of CVD graphene on modified substrate is enhanced by almost 5-fold; consistently the residual carrier concentration is reduced down to 10{sup 11} cm{sup −2}. Moreover, scalable and reliable p- and n-type graphene and graphene p-n junction are achieved on various silane SAMs with different functional groups.

  19. Silicon Chemical Vapor Deposition on macro and submicron powders in a fluidized bed

    SciTech Connect

    Cadoret, L.; Reuge, N; Pannala, Sreekanth; Syamlal, M; Rossignol, C; Dexpert-Ghys, J; Coufort, C; Caussat, B

    2009-01-01

    Titanium oxide (TiO2) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibro-fluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH4). Experimental results show that for the conditions tested, the original granular structure of the powders is preserved for 90% of the initial bed weight while the remaining 10% consisted of agglomerates in millimetre range found near the distributor of the reactor. A comparison between experimental and modelling results using the MFIX code shows that for Geldart's Group B alumina particles (Al2O3), the model represents both the bed hydrodynamics and silane conversion rates quite well. The future objective is to extend the simulation capability to cohesive submicron powders in order to achieve better predictability of the phenomena governing ultrafine particles.

  20. One-step synthesis of chlorinated graphene by plasma enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Fan, Liwei; Zhang, Hui; Zhang, Pingping; Sun, Xuhui

    2015-08-01

    We developed an approach to synthesize the chlorinated single layer graphene (Cl-G) by one-step plasma enhanced chemical vapor deposition. Copper foil was simply treated with hydrochloric acid and then CuCl2 formed on the surface was used as Cl source under the assistance of plasma treatment. Compared with other two-step methods by post plasma/photochemical treatment of CVD-grown single layer graphene (SLG), one-step Cl-G synthesis approach is quite straightforward and effective. X-ray photoelectron spectroscopy (XPS) revealed that ∼2.45 atom% Cl remained in SLG. Compared with the pristine SLG, the obvious blue shifts of G band and 2D band along with the appearance of D' band and D + G band in the Raman spectra indicate p-type doping of Cl-G.

  1. Nanoscale arrays of antimony telluride single crystals by selective chemical vapor deposition.

    PubMed

    Huang, Ruomeng; Benjamin, Sophie L; Gurnani, Chitra; Wang, Yudong; Hector, Andrew L; Levason, William; Reid, Gillian; De Groot, C H Kees

    2016-01-01

    Arrays of individual single nanocrystals of Sb2Te3 have been formed using selective chemical vapor deposition (CVD) from a single source precursor. Crystals are self-assembled reproducibly in confined spaces of 100 nm diameter with pitch down to 500 nm. The distribution of crystallite sizes across the arrays is very narrow (standard deviation of 15%) and is affected by both the hole diameter and the array pitch. The preferred growth of the crystals in the <1 1 0> orientation along the diagonal of the square holes strongly indicates that the diffusion of adatoms results in a near thermodynamic equilibrium growth mechanism of the nuclei. A clear relationship between electrical resistivity and selectivity is established across a range of metal selenides and tellurides, showing that conductive materials result in more selective growth and suggesting that electron donation is of critical importance for selective deposition. PMID:27283116

  2. Boron nitride nanowires synthesis via a simple chemical vapor deposition at 1200 °C

    NASA Astrophysics Data System (ADS)

    Ahmad, Pervaiz; Khandaker, Mayeen Uddin; Amin, Yusoff Mohd; Khan, Ziaul Raza

    2015-04-01

    A very simple chemical vapor deposition technique is used to synthesize high quality boron nitride nanowires at 1200 ˚C within a short growth duration of 30 min. FESEM micrograph shows that the as-synthesized boron nitride nanowires have a clear wire like morphology with diameter in the range of ˜20 to 150 nm. HR-TEM confirmed the wire-like structure of boron nitride nanowires, whereas XPS and Raman spectroscopy are used to find out the elemental composition and phase of the synthesized material. The synthesized boron nitride nanowires have potential applications as a sensing element in solid state neutron detector, neutron capture therapy and microelectronic devices with uniform electronic properties.

  3. Analysis of mass transport in an atmospheric pressure remote plasma-enhanced chemical vapor deposition process

    SciTech Connect

    Cardoso, R. P.; Belmonte, T.; Henrion, G.; Gries, T.; Tixhon, E.

    2010-01-15

    In remote microwave plasma enhanced chemical vapor deposition processes operated at atmospheric pressure, high deposition rates are associated with the localization of precursors on the treated surface. We show that mass transport can be advantageously ensured by convection for the heavier precursor, the lighter being driven by turbulent diffusion toward the surface. Transport by laminar diffusion is negligible. The use of high flow rates is mandatory to have a good mixing of species. The use of an injection nozzle with micrometer-sized hole enables us to define accurately the reaction area between the reactive species. The localization of the flow leads to high deposition rates by confining the reactive species over a small area, the deposition yield being therefore very high. Increasing the temperature modifies nonlinearly the deposition rates and the coating properties.

  4. Thermal Conductivity of Nanocrystalline Silicon Prepared by Chemical-Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Kearney, Brian; Liu, Xiao; Jugdersuren, Battogtokh; Queen, Daniel; Metcalf, Thomas; Culbertson, James; Chervin, Christopher; Stroud, Rhonda; Nemeth, William; Wang, Qi

    2015-03-01

    Thin film nanocrystalline silicon prepared by chemical-vapor deposition is an established material used in multijunction amorphous silicon solar cells. Its potential in low cost and scalable thermoelectric applications depends on the reducing grain sizes to nanometers while simultaneously maintaining a high crystalline to amorphous ratio. In this work, we show that by varying the hydrogen dilution of silane gas flow during deposition, we can reduce average grain sizes to a few nanometers while still maintaining ~ 90% crystallinity of the material. Annealing at 600 °C improves crystalline content with only a small increase of the grain sizes. The values of thermal conductivity, measured from 85 K to room temperature as function of hydrogen dilution ratio from full amorphous to nanocrystalline silicon, remain at a level that is typical for amorphous silicon. Office of Naval Research.

  5. Thermoelectric Power of Nanocrystalline Silicon Prepared by Hot-Wire Chemical-Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Kearney, Brian; Liu, Xiao; Jugdersuren, Battogtokh; Queen, Daniel; Metcalf, Thomas; Culbertson, James; Chervin, Christopher; Stroud, Rhonda; Nemeth, William; Wang, Qi

    Although doped bulk silicon possesses a favorable Seebeck coefficient and electrical conductivity, its thermal conductivity is too large for practical thermoelectric applications. Thin film nanocrystalline silicon prepared by hot-wire chemical-vapor deposition (HWCVD) is an established material used in multijunction amorphous silicon solar cells. Its potential in low cost and scalable thermoelectric applications depends on achieving a low thermal conductivity without sacrificing thermoelectric power and electrical conductivity. We examine the thermoelectric power of boron-doped HWCVD nanocrystalline silicon and find that it is comparable to doped nanostructured silicon alloys prepared by other methods. Given the low thermal conductivity and high electrical conductivity of these materials, they can achieve a high thermoelectric figure of merit, ZT. Work supported by the Office of Naval Research.

  6. III-nitride quantum cascade detector grown by metal organic chemical vapor deposition

    SciTech Connect

    Song, Yu Huang, Tzu-Yung; Badami, Pranav; Gmachl, Claire; Bhat, Rajaram; Zah, Chung-En

    2014-11-03

    Quantum cascade (QC) detectors in the GaN/Al{sub x}Ga{sub 1−x}N material system grown by metal organic chemical vapor deposition are designed, fabricated, and characterized. Only two material compositions, i.e., GaN as wells and Al{sub 0.5}Ga{sub 0.5}N as barriers are used in the active layers. The QC detectors operates around 4 μm, with a peak responsivity of up to ∼100 μA/W and a detectivity of up to 10{sup 8} Jones at the background limited infrared performance temperature around 140 K.

  7. Diamond synthesis at atmospheric pressure by microwave capillary plasma chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Hemawan, Kadek W.; Gou, Huiyang; Hemley, Russell J.

    2015-11-01

    Polycrystalline diamond has been synthesized on silicon substrates at atmospheric pressure, using a microwave capillary plasma chemical vapor deposition technique. The CH4/Ar plasma was generated inside of quartz capillary tubes using 2.45 GHz microwave excitation without adding H2 into the deposition gas chemistry. Electronically excited species of CN, C2, Ar, N2, CH, Hβ, and Hα were observed in the emission spectra. Raman measurements of deposited material indicate the formation of well-crystallized diamond, as evidenced by the sharp T2g phonon at 1333 cm-1 peak relative to the Raman features of graphitic carbon. Field emission scanning electron microscopy images reveal that, depending on the growth conditions, the carbon microstructures of grown films exhibit "coral" and "cauliflower-like" morphologies or well-facetted diamond crystals with grain sizes ranging from 100 nm to 10 μm.

  8. Preparation of γ-Al2O3 films by laser chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Gao, Ming; Ito, Akihiko; Goto, Takashi

    2015-06-01

    γ- and α-Al2O3 films were prepared by chemical vapor deposition using CO2, Nd:YAG, and InGaAs lasers to investigate the effects of varying the laser wavelength and deposition conditions on the phase composition and microstructure. The CO2 laser was found to mostly produce α-Al2O3 films, whereas the Nd:YAG and InGaAs lasers produced γ-Al2O3 films when used at a high total pressure. γ-Al2O3 films had a cauliflower-like structure, while the α-Al2O3 films had a dense and columnar structure. Of the three lasers, it was the Nd:YAG laser that interacted most with intermediate gas species. This promoted γ-Al2O3 nucleation in the gas phase at high total pressure, which explains the cauliflower-like structure of nanoparticles observed.

  9. Improved carrier mobility of chemical vapor deposition-graphene by counter-doping with hydrazine hydrate

    SciTech Connect

    Chen, Zhiying; Zhang, Yanhui; Zhang, Haoran; Sui, Yanping; Zhang, Yaqian; Ge, Xiaoming; Yu, Guanghui Xie, Xiaoming; Li, Xiaoliang; Jin, Zhi; Liu, Xinyu

    2015-03-02

    We developed a counter-doping method to tune the electronic properties of chemical vapor deposition (CVD)-grown graphene by varying the concentration and time of graphene exposure to hydrazine hydrate (N{sub 2}H{sub 4}·H{sub 2}O). The shift of G and 2D peaks of Raman spectroscopy is analyzed as a function of N{sub 2}H{sub 4}·H{sub 2}O concentration. The result revealed that N{sub 2}H{sub 4}·H{sub 2}O realized n-type doping on CVD grown graphene. X-ray photoelectron spectroscopy measurement proved the existence of nitrogen, which indicated the adsorption of N{sub 2}H{sub 4} on the surface of graphene. After counter-doping, carrier mobility, which was measured by Hall measurements, increased three fold.

  10. Simultaneous growth of diamond and nanostructured graphite thin films by hot-filament chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Ali, M.; Ürgen, M.

    2012-01-01

    Diamond and graphite films on silicon wafer were simultaneously synthesized at 850 °C without any additional catalyst. The synthesis was achieved in hot-filament chemical vapor deposition reactor by changing distance among filaments in traditional gas mixture. The inter-wire distance for diamond and graphite deposition was kept 5 and 15 mm, whereas kept constant from the substrate. The Raman spectroscopic analyses show that film deposited at 5 mm is good quality diamond and at 15 mm is nanostructured graphite and respective growths confirm by scanning auger electron microscopy. The scanning electron microscope results exhibit that black soot graphite is composed of needle-like nanostructures, whereas diamond with pyramidal featured structure. Transformation of diamond into graphite mainly attributes lacking in atomic hydrogen. The present study develops new trend in the field of carbon based coatings, where single substrate incorporate dual application can be utilized.

  11. Synthesis of bamboo-shaped multiwalled carbon nanotubes using thermal chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Lee, Cheol Jin; Park, Jung Hoon; Park, Jeunghee

    2000-06-01

    The vertically aligned multiwalled carbon nanotubes (CNT) are synthesized in high density on a large area of cobalt deposited silicon oxide substrate, by thermal chemical vapor deposition using C 2H 2 gas, at 950°C. The diameter of CNTs is distributed in the range of 80-120 nm and the length is about 20 μm. High-resolution transmission electron microscopy analysis reveals that the multiwalled CNTs have the crystalline graphite sheets and the bamboo structure that the tube consists of hollow compartments separated with graphite layers. A possible growth mechanism is suggested to explain the structure of CNTs. The emission current density is 1.1 mA cm -2 at 4.5 V μm -1, showing the Fowler-Nordheim behavior.

  12. Minimizing artifact formation in magnetorheological finishing of chemical vapor deposition ZnS flats.

    PubMed

    Kozhinova, Irina A; Romanofsky, Henry J; Maltsev, Alexander; Jacobs, Stephen D; Kordonski, William I; Gorodkin, Sergei R

    2005-08-01

    The polishing performance of magnetorheological (MR) fluids prepared with a variety of magnetic and nonmagnetic ingredients was studied on four types of initial surface for chemical vapor deposition (CVD) ZnS flats from domestic and foreign sources. The results showed that it was possible to greatly improve smoothing performance of magnetorheological finishing (MRF) by altering the fluid composition, with the best results obtained for nanoalumina abrasive used with soft carbonyl iron and altered MR fluid chemistry. Surface roughness did not exceed 20 nm peak to valley and 2 nm rms after removal of 2 microm of material. The formation of orange peel and the exposure of a pebblelike structure inherent in ZnS from the CVD process were suppressed. PMID:16075880

  13. Synchrotron radiation x-ray beam profile monitor using chemical vapor deposition diamond film

    SciTech Connect

    Kudo, Togo; Takahashi, Sunao; Nariyama, Nobuteru; Hirono, Toko; Tachibana, Takeshi; Kitamura, Hideo

    2006-12-15

    Photoluminescence (PL) of a Si-doped polycrystalline diamond film fabricated using the chemical vapor deposition technique was employed to measure the profile of a synchrotron radiation pink x-ray beam emitted from an in-vacuum hybrid undulator at the SPring-8 facility. The spectrum of the section of the diamond film penetrated by the emitted visible red light exhibited a peak at 739 nm and a wideband structure extending from 550 to 700 nm. The PL intensity increased with the absorbed dose of the incident beam in the diamond within a dynamic range of 10{sup 3}. A two-dimensional distribution of the PL intensity revealed the undulator beam profile.

  14. Selective charge doping of chemical vapor deposition-grown graphene by interface modification

    NASA Astrophysics Data System (ADS)

    Wang, Shengnan; Suzuki, Satoru; Furukawa, Kazuaki; Orofeo, Carlo M.; Takamura, Makoto; Hibino, Hiroki

    2013-12-01

    The doping and scattering effect of substrate on the electronic properties of chemical vapor deposition (CVD)-grown graphene are revealed. Wet etching the underlying SiO2 of graphene and depositing self-assembled monolayers (SAMs) of organosilane between graphene and SiO2 are used to modify various substrates for CVD graphene transistors. Comparing with the bare SiO2 substrate, the carrier mobility of CVD graphene on modified substrate is enhanced by almost 5-fold; consistently the residual carrier concentration is reduced down to 1011 cm-2. Moreover, scalable and reliable p- and n-type graphene and graphene p-n junction are achieved on various silane SAMs with different functional groups.

  15. High-strength chemical-vapor-deposited graphene and grain boundaries.

    PubMed

    Lee, Gwan-Hyoung; Cooper, Ryan C; An, Sung Joo; Lee, Sunwoo; van der Zande, Arend; Petrone, Nicholas; Hammerberg, Alexandra G; Lee, Changgu; Crawford, Bryan; Oliver, Warren; Kysar, Jeffrey W; Hone, James

    2013-05-31

    Pristine graphene is the strongest material ever measured. However, large-area graphene films produced by means of chemical vapor deposition (CVD) are polycrystalline and thus contain grain boundaries that can potentially weaken the material. We combined structural characterization by means of transmission electron microscopy with nanoindentation in order to study the mechanical properties of CVD-graphene films with different grain sizes. We show that the elastic stiffness of CVD-graphene is identical to that of pristine graphene if postprocessing steps avoid damage or rippling. Its strength is only slightly reduced despite the existence of grain boundaries. Indentation tests directly on grain boundaries confirm that they are almost as strong as pristine. Graphene films consisting entirely of well-stitched grain boundaries can retain ultrahigh strength, which is critical for a large variety of applications, such as flexible electronics and strengthening components. PMID:23723231

  16. Transport properties of monolayer MoS2 grown by chemical vapor deposition.

    PubMed

    Schmidt, Hennrik; Wang, Shunfeng; Chu, Leiqiang; Toh, Minglin; Kumar, Rajeev; Zhao, Weijie; Neto, A H Castro; Martin, Jens; Adam, Shaffique; Özyilmaz, Barbaros; Eda, Goki

    2014-01-01

    Recent success in the growth of monolayer MoS2 via chemical vapor deposition (CVD) has opened up prospects for the implementation of these materials into thin film electronic and optoelectronic devices. Here, we investigate the electronic transport properties of individual crystallites of high quality CVD-grown monolayer MoS2. The devices show low temperature mobilities up to 500 cm(2) V(-1) s(-1) and a clear signature of metallic conduction at high doping densities. These characteristics are comparable to the electronic properties of the best mechanically exfoliated monolayers in literature, verifying the high electronic quality of the CVD-grown materials. We analyze the different scattering mechanisms and show that the short-range scattering plays a dominant role in the highly conducting regime at low temperatures. Additionally, the influence of optical phonons as a limiting factor is discussed. PMID:24640984

  17. In situ nitrogen-doped graphene grown from polydimethylsiloxane by plasma enhanced chemical vapor deposition.

    PubMed

    Wang, Chundong; Zhou, Yungang; He, Lifang; Ng, Tsz-Wai; Hong, Guo; Wu, Qi-Hui; Gao, Fei; Lee, Chun-Sing; Zhang, Wenjun

    2013-01-21

    Due to its unique electronic properties and wide spectrum of promising applications, graphene has attracted much attention from scientists in various fields. Control and engineering of graphene's semiconducting properties is considered to be key to its applications in electronic devices. Here, we report a novel method to prepare in situ nitrogen-doped graphene by microwave plasma assisted chemical vapor deposition (CVD) using PDMS (polydimethylsiloxane) as a solid carbon source. Based on this approach, the concentration of nitrogen-doping can be easily controlled via the flow rate of nitrogen during the CVD process. X-ray photoelectron spectroscopy results indicated that the nitrogen atoms doped into the graphene lattice were mainly in the forms of pyridinic and pyrrolic structures. Moreover, first-principles calculations show that the incorporated nitrogen atoms can lead to p-type doping of graphene. This in situ approach provides a promising strategy to prepare graphene with controlled electronic properties. PMID:23203220

  18. Improved carrier mobility of chemical vapor deposition-graphene by counter-doping with hydrazine hydrate

    NASA Astrophysics Data System (ADS)

    Chen, Zhiying; Zhang, Yanhui; Zhang, Haoran; Sui, Yanping; Zhang, Yaqian; Ge, Xiaoming; Yu, Guanghui; Xie, Xiaoming; Li, Xiaoliang; Jin, Zhi; Liu, Xinyu

    2015-03-01

    We developed a counter-doping method to tune the electronic properties of chemical vapor deposition (CVD)-grown graphene by varying the concentration and time of graphene exposure to hydrazine hydrate (N2H4.H2O). The shift of G and 2D peaks of Raman spectroscopy is analyzed as a function of N2H4.H2O concentration. The result revealed that N2H4.H2O realized n-type doping on CVD grown graphene. X-ray photoelectron spectroscopy measurement proved the existence of nitrogen, which indicated the adsorption of N2H4 on the surface of graphene. After counter-doping, carrier mobility, which was measured by Hall measurements, increased three fold.

  19. Defect Characterization in Ge/(001)Si Epitaxial Films Grown by Reduced-Pressure Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Bharathan, Jayesh; Narayan, Jagdish; Rozgonyi, George; Bulman, Gary E.

    2013-10-01

    We studied the microstructural characteristics and electrical properties of epitaxial Ge films grown on Si(001) substrates by x-ray diffraction, atomic force microscopy, and transmission electron microscopy. The films were grown using a two-step technique by reduced-pressure chemical vapor deposition, where the first step promotes two-dimensional growth at a lower substrate temperature. We observed a decrease in defect density with increasing film thickness. Ge films with thickness of 3.5 μm exhibited threading dislocation densities of 5 × 106 cm-2, which yielded devices with dark current density of 5 mA cm-2 (1 V reverse bias). We also noted the presence of stacking faults in the form of lines in the films and establish that this is an important defect for Ge films grown by this deposition technique.

  20. Electrical properties of boron-doped MWNTs synthesized by hot-filament chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Ishii, S.; Nagao, M.; Watanabe, T.; Tsuda, S.; Yamaguchi, T.; Takano, Y.

    2009-10-01

    We have synthesized a large amount of boron-doped multiwalled carbon nanotubes (MWNTs) by hot-filament chemical vapor deposition. The synthesis was carried out in a flask using a methanol solution of boric acid as a source material. The scanning electron microscopy, transmission electron microscopy, and micro-Raman spectroscopy were performed to evaluate the structural properties of the obtained MWNTs. In order to evaluate the electrical properties, temperature dependence of resistivity was measured in an individual MWNTs with four metal electrodes. The Raman shifts suggest carrier injection into the boron-doped MWNTs, but the resistivity of the MWNTs was high and increased strongly with decreasing temperature. Defects induced by the plasma may cause this enhanced resistivity.

  1. Hydrogen treatment of undoped ZnO thin film using photo-chemical vapor deposition

    SciTech Connect

    Baik, S.J.; Lim, K.S.; Song, J.

    1996-12-31

    To obtain high quality ZnO thin films for use as transparent electrodes of amorphous silicon solar cells, hydrogen treatment of the films using photo-chemical vapor deposition was performed for the first time. The as-deposited ZnO thin film was irradiated by UV light during the flow of hydrogen molecules in the presence of photo-sensitizers of mercury. As the treatment time increased, resistivity decreased from 1 {times} 10{sup {minus}2}{Omega}cm to 2 {times} 10{sup {minus}3}{Omega}cm. Moreover, haze ratio increased from 20% to 48%. Hydrogen radicals were thought to be playing various roles on the neighborhood of the surface region and the grain boundary region. This new trial gave us new understanding into the relation between hydrogen and ZnO. Moreover, these results could be applied to the process of amorphous silicon solar cells and a possible increase of efficiency is expected.

  2. Capillary - Discharge Based Hand-Held Detector For Chemical Vapor Monitoring

    DOEpatents

    Duan, Yixiang

    2005-05-31

    A handheld/portable detector for chemical vapor monitoring includes a housing and a discharge chamber that is established therein. The plasma discharge has a relatively small volume, e.g., in the micro-liter range. A first electrode and a second electrode are disposed within the discharge chamber and a discharge gap is established therebetween. A sample gas tube is in fluid communication with the discharge chamber and provides a sample gas to the discharge chamber. Also, a plasma gas tube is in fluid communication with the discharge chamber and provides a plasma gas thereto. Accordingly, the plasma gas can be used to maintain microplasma discharge between the electrodes and the sample gas can be introduced into the microplasma discharge. A spectrometer optically connected to the handheld/portable detector is used to measure the radiation emitted by the sample gas when subjected to the microplasma discharge.

  3. Direct Growth Properties of Graphene Layers on Sapphire Substrate by Alcohol-Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Nakamura, Atsushi; Miyasaka, Yuta; Temmyo, Jiro

    2012-04-01

    Few nanometers thick graphene layers were directly grown on a-plane (11bar 20) sapphire substrates by alcohol-chemical vapor deposition (alcohol-CVD) using ethanol as a carbon source and without any catalytic metal on the substrate surface. The growth relationship between the graphene layer and substrate was analyzed using a transmission electron microscope (TEM). The growth rate of graphene layers with different growth temperatures revealed that the Al atom act as a catalyst for synthesizing a graphitic material during the decomposition of ethanol. An optical transmittance and a sheet resistance of the graphene sheet directly grown on sapphire substrate were observed. SiO2/Si and n-6H-SiC substrates were also examined for graphene direct growth to discuss the catalytic behavior of Si atoms compared with Al atoms.

  4. Effect of cooling condition on chemical vapor deposition synthesis of graphene on copper catalyst.

    PubMed

    Choi, Dong Soo; Kim, Keun Soo; Kim, Hyeongkeun; Kim, Yena; Kim, TaeYoung; Rhy, Se-hyun; Yang, Cheol-Min; Yoon, Dae Ho; Yang, Woo Seok

    2014-11-26

    Here, we show that chemical vapor deposition growth of graphene on copper foil is strongly affected by the cooling conditions. Variation of cooling conditions such as cooling rate and hydrocarbon concentration in the cooling step has yielded graphene islands with different sizes, density of nuclei, and growth rates. The nucleation site density on Cu substrate is greatly reduced when the fast cooling condition was applied, while continuing methane flow during the cooling step also influences the nucleation and growth rate. Raman spectra indicate that the graphene synthesized under fast cooling condition and methane flow on cool-down exhibit superior quality of graphene. Further studies suggest that careful control of the cooling rate and CH4 gas flow on the cooling step yield a high quality of graphene. PMID:25386721

  5. Nickel doping of boron carbide grown by plasma enhanced chemical vapor deposition

    SciTech Connect

    Hwang, S.; Remmes, N.B.; Dowben, P.A.; McIlroy, D.N.

    1996-07-01

    We have nickel doped boron carbide grown by plasma enhanced chemical vapor deposition. The source gas closo-1,2-dicarbadodecaborane (ortho-carborane) was used to grow the boron carbide, while nickelocene [Ni(C{sub 5}H{sub 5}){sub 2}] was used to introduce nickel into the growing film. The doping of nickel transformed a {ital p}-type, B{sub 5}C material, relative to lightly doped {ital n}-type silicon, to an {ital n}-type material. Both {ital n}-{ital n} heterojunction diodes and {ital n}-{ital p} heterojunction diodes were constructed, using as substrates {ital n}- and {ital p}-type Si(111), respectively. With sufficient partial pressures of nickelocene in the plasma reactor, diodes with characteristic tunnel diode behavior can be successfully fabricated. {copyright} {ital 1996 American Vacuum Society}

  6. Electrical characterization of graphene films synthesized by low-temperature microwave plasma chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Okigawa, Yuki; Tsugawa, Kazuo; Yamada, Takatoshi; Ishihara, Masatou; Hasegawa, Masataka

    2013-10-01

    In this Letter, we discuss the results of Hall effect measurements to examine the electrical properties of the graphene films synthesized by low-temperature microwave plasma chemical vapor deposition. Van der Pauw devices with sizes of 50-100 μm were fabricated, for which we observed p-type conduction and mobility from 10 to 100 cm2/V s. To investigate the mobility dispersion, we performed Raman mapping to quantify the number of defects and the disorder in graphene films. The results suggest that the D-band/G-band intensity ratio is correlated with the mobility. Moreover, we discuss the factors controlling the mobility and how to improve the quality of the graphene films by reducing the number of defects.

  7. Ion-induced epitaxial growth of chemical vapor deposited Si layers

    NASA Astrophysics Data System (ADS)

    La Ferla, A.; Rimini, E.; Ferla, G.

    1988-02-01

    Thin layers of Si were chemical vapor deposited onto as-received <100> p-type Si wafers. The samples were subsequently implanted with 1×1015/cm2, 80 keV As. The native oxide film impedes the growth even at 800 °C, 1 h; instead irradiation with 600 keV Kr++ at 450 °C causes the epitaxial growth of the entire deposited and amorphized Si layer. The sheet resistance of these As-doped layers (130 Ω/⧠) coincides with that of samples in which the amorphous layer was obtained by As ion implantation only. The value is at least ten times lower than that of the polycrystalline layer doped with the same amount of As.

  8. In situ nitrogen-doped graphene grown from polydimethylsiloxane by plasma enhanced chemical vapor deposition

    SciTech Connect

    Wang, Chundong; Zhou, Yungang; He, Lifang; Ng, Tsz-Wai; Hong, Guo; Wu, Qi-Hui; Gao, Fei; Lee, Chun-Sing; Zhang, Wenjun

    2013-01-21

    Due to its unique electronic properties and wide spectrum of promising applications, graphene has attracted much attention from scientists in various fields. Control and engineering of graphene’s semiconducting properties is considered to be the key of its applications in electronic devices. Here, we report a novel method to prepare in situ nitrogen-doped graphene by microwave plasma assisted chemical vapor deposition (CVD) using PDMS (Polydimethylsiloxane) as a solid carbon source. Based on this approach, the concentration of nitrogen-doping can be easily controlled via the flow rate of nitrogen during the CVD process. X-ray photoelectron spectroscopy results indicated that the nitrogen atoms doped into graphene lattice were mainly in the forms of pyridinic and pyrrolic structures. Moreover, first-principles calculations show that the incorporated nitrogen atoms can lead to p-type doping of graphene. This in situ approach provides a promising strategy to prepare graphene with controlled electronic properties.

  9. Strong flux pinning centers in Y-Ba-Cu-O films prepared by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Watanabe, K.; Matsushita, T.; Kobayashi, N.; Kawabe, H.; Aoyagi, E.; Hiraga, K.; Yamane, H.; Kurosawa, H.; Hirai, T.; Muto, Y.

    1990-04-01

    The Y-Ba-Cu-O film prepared by chemical vapor deposition showed Tc=91.5 K and Bc2 (77.3 K)=60 T defined by zero resistance. The Jc values measured at 77.3 K were 7.8×105 A/cm2 at B=0 and 1.0×105 A/cm2 at 16 T, magnetic fields perpendicular to the c axis. Small disk-shaped precipitates possibly regarded as strong flux pinning centers in the Y-Ba-Cu-O films were observed using transmission electron microscopy. The evaluation of Jc related to the concentration and configuration of the precipitates was in reasonable agreement with the measured Jc values.

  10. Surface modification of titanium membrane by chemical vapor deposition and its electrochemical self-cleaning

    NASA Astrophysics Data System (ADS)

    Li, X. W.; Li, J. X.; Gao, C. Y.; Chang, M.

    2011-10-01

    Membrane separation is applied widely in many fields, while concentration polarization and membrane fouling, limiting its promotion and application greatly, are the bottlenecks in membrane application. Among which, membrane fouling is irreversible, membrane must be periodically cleaned or even replaced to restore permeability. Membrane cleaning has become one of the key issues in membrane separation areas. Considering incomparable electrochemical advantages of boron-doped diamond (BDD) film electrode over conventional electrode, a new composite membrane Ti/BDD, made by depositing CVD (chemical vapor deposition) boron-doped diamond film on titanium(Ti) membrane to modify porous titanium surface, that can be cleaned electrochemically is proposed. Feasibility of its preparation and application is discussed in this paper. Results shows that based on the unique electrochemical properties of diamond, cleaning level of this composite Ti/BDD membrane is significantly increased, making membrane life and efficiency improved prominently.

  11. Experimental and Theoretical Analysis of Chemical Vapor Deposition with Prediction of Gravity Effects

    NASA Technical Reports Server (NTRS)

    Stinespring, C. D.; Spear, K. E.

    1985-01-01

    A combined experimental and theoretical study to characterize the effects of gravitationally-induced transport on atmospheric pressure silicon epitaxy by SiH4 pyrolysis is planned. Experimentally, flow regimes in which free convective transport contributes to the Chemical Vapor Deposition (CVD) process will be identified, and, for these conditions, the flow and deposition process will be characterized. Specifically, this will include measurements of three dimensional temperature variations using in situ Rayleigh scattering, gas phase composition profiles using laser absorption and fluorescence techniques, and deposition rates and defect densities. Subsequently, the free convective transport contribution to the CVD process will be minimized and/or altered while leaving deposition chemistry unaltered, and the characterization will be repeated. Based on these analyses, the effects of gravitationally-induced transport on atmospheric pressure CVD will be assessed.

  12. Plasma-enhanced chemical vapor deposition method to coat micropipettes with diamond-like carbon

    SciTech Connect

    Kakuta, Naoto; Watanabe, Mayu; Yamada, Yukio; Okuyama, Naoki; Mabuchi, Kunihiko

    2005-07-15

    This article provides a simple method for coating glass micropipettes with diamond-like carbon (DLC) through plasma-enhanced chemical vapor deposition. The apparatus uses a cathode that is a thin-metal-coated micropipette itself and an anode that is a meshed cylinder with its cylinder axis along the micropipette length. To produce a uniform plasma and prevent a temperature increase at the tip due to ion collision concentration, we investigated the effect of the height and diameter of the meshed cylindrical anode on the plasma. Intermittent deposition is also effective for inhibiting the temperature rise and producing high quality DLC films. Measured Raman spectra and electric resistivity indicate that a DLC film suitable for use as an insulating film can be produced on the micropipette. This coating method should also be useful for other extremely small probes.

  13. Material characterization of chemical vapor deposited TiB2 fibers

    SciTech Connect

    Revankar, V.; Lakhotia, V.; Hlavacek, V.

    1991-08-01

    Titanium diboride fiber which is capable of reinforcing metal matrices at high temperatures has been developed by chemical vapor deposition method on tungsten core. A thermodynamic analysis of the TiCl4 + BCl3 + H2 system has been carried out to determine the operating conditions for the highest equilibrium yield of TiB2. The optimum experimental conditions for deposition are obtained. Surface morphologies of the deposits obtained were studied as functions of substrate surface temperature and concentration of reactants. Crystal orientation was determined by different analytical methods. Effect of thermal stresses on the deposit and a remedy to improve its effect were thoroughly studied. The resultant fibers showed reasonably good properties. 11 refs.

  14. Development of polishing methods for Chemical Vapor Deposited Silicon Carbide mirrors for synchrotron radiation

    SciTech Connect

    Fuchs, B.A.; Brown, N.J.

    1987-01-01

    Material properties of Chemical Vapor Deposited Silicon Carbide (CVD SiC) make it ideal for use in mirrors for synchrotron radiation experiments. We developed methods to grind and polish flat samples of CVD SiC down to measured surface roughness values as low as 1.1 Angstroms rms. We describe the processing details, including observations we made during trial runs with alternative processing recipes. We conclude that pitch polishing using progressively finer diamond abrasive, augmented with specific water based lubricants and additives, produces superior results. Using methods based on these results, a cylindrical and a toroidal mirror, each about 100 x 300mm, were respectively finished by Continental Optical and Frank Cooke, Incorporated. WYCO Interferometry shows these mirrors have surface roughness less than 5.7 Angstroms rms. These mirrors have been installed on the LLNL/UC X-ray Calibration and Standards Facility at the Stanford Synthrotron Radiation Laboratory.

  15. Structural and electronic characterization of graphene grown by chemical vapor deposition and transferred onto sapphire

    NASA Astrophysics Data System (ADS)

    Joucken, Frédéric; Colomer, Jean-François; Sporken, Robert; Reckinger, Nicolas

    2016-08-01

    We present a combination of magnetotransport and local probe measurements on graphene grown by chemical vapor deposition on copper foil and subsequently transferred onto a sapphire substrate. A rather strong p-doping is observed (∼9 × 1012 cm-2) together with quite low carrier mobility (∼1350 cm2/V s). Atomic force and tunneling imaging performed on the transport devices reveals the presence of contaminants between sapphire and graphene, explaining the limited performance of our devices. The transferred graphene displays ridges similar to those observed whilst graphene is still on the copper foil. We show that, on sapphire, these ridges are made of different thicknesses of the contamination layer and that, contrary to what was reported for hBN or certain transition metal dichalcogenides, no self-cleansing process of the sapphire substrate is observed.

  16. Effect of Hydrogen in Size-Limited Growth of Graphene by Atmospheric Pressure Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Zhang, Haoran; Zhang, Yanhui; Wang, Bin; Chen, Zhiying; Sui, Yanping; Zhang, Yaqian; Tang, Chunmiao; Zhu, Bo; Xie, Xiaoming; Yu, Guanghui; Jin, Zhi; Liu, Xinyu

    2015-01-01

    Analysis of graphene domain synthesis explains the main graphene growth process. Size-limited graphene growth caused by hydrogen is studied to achieve efficient graphene synthesis. Graphene synthesis on Cu foils via the chemical vapor deposition method using methane as carbon source is limited by high hydrogen concentration. Results indicate that hydrogen affects graphene nucleation, the growth rate, and the final domain size. Considering the role of hydrogen as both activator and etching reagent, we build a model to explain the cause of this low graphene growth rate for high hydrogen partial pressure. A two-step method is proposed to control the graphene nucleation and growth rate separately. Half the time is required to obtain similar domain size compared with single-step synthesis, indicating improved graphene synthesis efficiency. The change of the partial pressure and transmission time between the two steps is a factor that cannot be ignored to control the graphene growth.

  17. Fluid modeling for plasma-enhanced direct current chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Ismagilov, Rinat R.; Khamidullin, Ildar R.; Kleshch, Victor I.; Malykhin, Sergei A.; Alexeev, Andrey M.; Obraztsov, Alexander N.

    2016-01-01

    A self-consistent continuum (fluid) model for a direct current discharge used in a chemical vapor deposition system is developed. The model is built for a two-dimensional axisymmetric system and incorporates an electron energy balance for low-pressure Ar gas. The underlying physics of the fluid model is briefly discussed. The fluid and Poisson equations for plasma species are used as the model background. The plasma species considered in the model include electrons, Ar+ ions, and Ar atoms in ground and excited states. Nine reactions between these species are taken into account, including surface reactions. The densities of various plasma species as well as the relative contributions of generation and annihilation processes for electrons, ions, and atoms are calculated. The concentrations for electrons and Ar+ ions on the order of 1020 m-3 are obtained for the plasma in the computer simulations.

  18. High Current Emission from Patterned Aligned Carbon Nanotubes Fabricated by Plasma-Enhanced Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Cui, Linfan; Chen, Jiangtao; Yang, Bingjun; Jiao, Tifeng

    2015-12-01

    Vertically, carbon nanotube (CNT) arrays were successfully fabricated on hexagon patterned Si substrates through radio frequency plasma-enhanced chemical vapor deposition using gas mixtures of acetylene (C2H2) and hydrogen (H2) with Fe/Al2O3 catalysts. The CNTs were found to be graphitized with multi-walled structures. Different H2/C2H2 gas flow rate ratio was used to investigate the effect on CNT growth, and the field emission properties were optimized. The CNT emitters exhibited excellent field emission performance (the turn-on and threshold fields were 2.1 and 2.4 V/μm, respectively). The largest emission current could reach 70 mA/cm2. The emission current was stable, and no obvious deterioration was observed during the long-term stability test of 50 h. The results were relevant for practical applications based on CNTs.

  19. High Current Emission from Patterned Aligned Carbon Nanotubes Fabricated by Plasma-Enhanced Chemical Vapor Deposition.

    PubMed

    Cui, Linfan; Chen, Jiangtao; Yang, Bingjun; Jiao, Tifeng

    2015-12-01

    Vertically, carbon nanotube (CNT) arrays were successfully fabricated on hexagon patterned Si substrates through radio frequency plasma-enhanced chemical vapor deposition using gas mixtures of acetylene (C2H2) and hydrogen (H2) with Fe/Al2O3 catalysts. The CNTs were found to be graphitized with multi-walled structures. Different H2/C2H2 gas flow rate ratio was used to investigate the effect on CNT growth, and the field emission properties were optimized. The CNT emitters exhibited excellent field emission performance (the turn-on and threshold fields were 2.1 and 2.4 V/μm, respectively). The largest emission current could reach 70 mA/cm(2). The emission current was stable, and no obvious deterioration was observed during the long-term stability test of 50 h. The results were relevant for practical applications based on CNTs. PMID:26666912

  20. Homogeneous nanocrystalline cubic silicon carbide films prepared by inductively coupled plasma chemical vapor deposition.

    PubMed

    Cheng, Qijin; Xu, S; Long, Jidong; Huang, Shiyong; Guo, Jun

    2007-11-21

    Silicon carbide films with different carbon concentrations x(C) have been synthesized by inductively coupled plasma chemical vapor deposition from a SiH(4)/CH(4)/H(2) gas mixture at a low substrate temperature of 500 °C. The characteristics of the films were studied by x-ray photoelectron spectroscopy, x-ray diffraction, scanning electron microscopy, high-resolution transmission electron microscopy, Fourier transform infrared absorption spectroscopy, and Raman spectroscopy. Our experimental results show that, at x(C) = 49 at.%, the film is made up of homogeneous nanocrystalline cubic silicon carbide without any phase of silicon, graphite, or diamond crystallites/clusters. The average size of SiC crystallites is approximately 6 nm. At a lower value of x(C), polycrystalline silicon and amorphous silicon carbide coexist in the films. At a higher value of x(C), amorphous carbon and silicon carbide coexist in the films. PMID:21730481

  1. Ultrahigh-mobility graphene devices from chemical vapor deposition on reusable copper

    PubMed Central

    Banszerus, Luca; Schmitz, Michael; Engels, Stephan; Dauber, Jan; Oellers, Martin; Haupt, Federica; Watanabe, Kenji; Taniguchi, Takashi; Beschoten, Bernd; Stampfer, Christoph

    2015-01-01

    Graphene research has prospered impressively in the past few years, and promising applications such as high-frequency transistors, magnetic field sensors, and flexible optoelectronics are just waiting for a scalable and cost-efficient fabrication technology to produce high-mobility graphene. Although significant progress has been made in chemical vapor deposition (CVD) and epitaxial growth of graphene, the carrier mobility obtained with these techniques is still significantly lower than what is achieved using exfoliated graphene. We show that the quality of CVD-grown graphene depends critically on the used transfer process, and we report on an advanced transfer technique that allows both reusing the copper substrate of the CVD growth and making devices with mobilities as high as 350,000 cm2 V–1 s–1, thus rivaling exfoliated graphene. PMID:26601221

  2. Free-standing thin film Ge single crystals grown by plasma-enhanced chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Outlaw, R. A.; Hopson, P., Jr.

    1984-01-01

    The films, which are approximately 10 microns in thickness, are grown epitaxially on polished (100) NaCl substrates at 450 C by plasma enhanced chemical vapor deposition. Upon cooling, the films are separated from the substrate by differential shear stress, leaving free-standing films of Ge which can be handled. Growths are attained by nucleating at minimum plasma power for very brief intervals and then raising the power to 65 W to increase the growth rate to approximately 10 microns/h. It is found that substrate exposure to the plasma at too high a power for too long a time sputters and erodes the surface, thereby substantially degrading the nucleation process and the ultimate growths. It is noted that the free-standing films are visually specular and exhibit a high degree of crystalline order when examined by X-ray diffraction. Auger electron spectroscopy and energy dispersive analysis of X-rays reveal no detectable bulk contamination.

  3. Effects of postdeposition treatments on the mechanical properties of a chemical-vapor-deposited silicon carbide

    SciTech Connect

    Wang, H.; Singh, R.N.; Goela, J.S.

    1995-09-01

    The influence of different postdeposition treatments such as water quench and thermal heating in air, nitrogen, and vacuum on mechanical properties of chemical-vapor-deposited (CVD) silicon carbide was investigated. The results showed that these postdeposition treatments increased the flexural strength by as much as 60% but did not significantly change other properties such as hardness and fracture toughness. The strength increase was achieved by treatments performed in both the oxidizing and nonoxidizing environments. Compressive residual stresses in CVD SiC increased because of these treatments, but this increase was not large enough to explain fully the observed increase in the flexural strength. It is proposed that these thermal treatments led to strength increase via healing of surface machining flaws. Thermal treatments in nonoxidizing environments reduced or blunted the flaws through the rearrangement of atoms and restoration of damaged crystal structure in SiC, while in oxidizing environments, passive oxidation may have served as an additional flaw healing mechanism.

  4. Plasma-enhanced-chemical-vapor-deposited ultralow k for a postintegration porogen removal approach

    SciTech Connect

    Jousseaume, V.; Favennec, L.; Zenasni, A.; Passemard, G.

    2006-05-01

    Conventional Cu-ultra low K (ULK) integration schemes lead to a drastic increase of the effective dielectric constant due to porous material degradation during process steps. Although a postintegration porogen removal scheme allows overcoming these issues, only spin-on dielectrics were developed to validate this approach. In this letter, plasma-enhanced chemical-vapor deposition is used to deposit ULK dielectric (k<2.5). The precursor chemistry and the deposition conditions have been chosen to obtain a material with the required characteristics to use a postintegration porogen removal approach: porogen thermal stability up to 325 deg. C, good mechanical properties of the hybrid film, no metallic barrier diffusion in the film, and a minimal shrinkage after the porogen removal treatment.

  5. Gas-phase silicon atom densities in the chemical vapor deposition of silicon from silane

    SciTech Connect

    Coltrin, M.E.; Breiland, W.G.; Ho, P.

    1993-12-31

    Silicon atom number density profiles have been measured using laser-induced fluorescence during the chemical vapor deposition of silicon from silane. Measurements were obtained in a rotating-disk reactor as a function of silane partial pressure and the amount of hydrogen added to the carrier gas. Absolute number densities were obtained using an atomic absorption technique. Results were compared with calculated density profiles from a model of the coupled fluid flow, gas-phase and surface chemistry for an infinite-radius rotating disk. An analysis of the reaction mechanism showed that the unimolecular decomposition of SiH{sub 2} is not the dominant source of Si atoms. Profile shapes and positions, and all experimental trends are well matched by the calculations. However, the calculated number density is up to 100 times smaller than measured.

  6. Stress hysteresis and mechanical properties of plasma-enhanced chemical vapor deposited dielectric films

    NASA Astrophysics Data System (ADS)

    Thurn, Jeremy; Cook, Robert F.; Kamarajugadda, Mallika; Bozeman, Steven P.; Stearns, Laura C.

    2004-02-01

    A comprehensive survey is described of the responses of three plasma-enhanced chemical vapor deposited dielectric film systems to thermal cycling and indentation contact. All three films—silicon oxide, silicon nitride, and silicon oxy-nitride—exhibited significant nonequilibrium permanent changes in film stress on thermal cycling or annealing. The linear relationship between stress and temperature changed after the films were annealed at 300 °C, representing a structural alteration in the film reflecting a change in coefficient of thermal expansion or biaxial modulus. A double-substrate method was used to deduce both thermoelastic properties before and after the anneal of selected films and the results were compared with the modulus deconvoluted from small-scale depth-sensing indentation experiments (nanoindentation). Rutherford backscattering spectrometry and hydrogen forward scattering were used to deduce the composition of the films and it was found that all the films contained significant amounts of hydrogen.

  7. Multiple substrate microwave plasma-assisted chemical vapor deposition single crystal diamond synthesis

    SciTech Connect

    Asmussen, J.; Grotjohn, T. A.; Reinhard, D. K.; Schuelke, T.; Becker, M. F.; Yaran, M. K.; King, D. J.; Wicklein, S.

    2008-07-21

    A multiple substrate, microwave plasma-assisted chemical vapor deposition synthesis process for single crystal diamond (SCD) is demonstrated using a 915 MHz reactor. Diamond synthesis was performed using input chemistries of 6-8% of CH{sub 4}/H{sub 2}, microwave input powers of 10-11.5 kW, substrate temperatures of 1100-1200 deg. C, and pressures of 110-135 Torr. The simultaneous synthesis of SCD over 70 diamond seeds yielded good quality SCD with deposition rates of 14-21 {mu}m/h. Multiple deposition runs totaling 145 h of deposition time added 1.8-2.5 mm of diamond material to each of the 70 seed crystals.

  8. Fabrication of nanocrystalline silicon layers by plasma enhanced chemical vapor deposition from silicon tetrafluoride

    SciTech Connect

    Sennikov, P. G. Golubev, S. V.; Shashkin, V. I.; Pryakhin, D. A.; Drozdov, M. N.; Andreev, B. A.; Drozdov, Yu. N.; Kuznetsov, A. S.; Pohl, H.-J.

    2009-07-15

    The data on fabrication of silicon layers on various substrates by plasma enhanced chemical vapor deposition from the (silicon tetrafluoride)-hydrogen system are reported. The emission spectra of the plasma in the system are recorded. The samples were studied by the X-ray diffraction and secondary ion mass spectrometry techniques. The morphologic properties of the surface are examined, and the Raman spectra, the transmittance spectra in the infrared region, and photoluminescence spectra are recorded. The phase composition of the layers corresponds to nanocrystalline silicon, in which the dimensions of coherent-scattering grains vary with the conditions of the preparation process in the range from 3 to 9 nm. The layers exhibit intense photoluminescence at room temperature.

  9. Metal-free plasma-enhanced chemical vapor deposition of large area nanocrystalline graphene

    NASA Astrophysics Data System (ADS)

    Schmidt, Marek E.; Xu, Cigang; Cooke, Mike; Mizuta, Hiroshi; Chong, Harold M. H.

    2014-04-01

    This paper reports on large area, metal-free deposition of nanocrystalline graphene (NCG) directly onto wet thermally oxidized 150 mm silicon substrates using parallel-plate plasma-enhanced chemical vapor deposition. Thickness non-uniformities as low as 13% are achieved over the whole substrate. The cluster size {{L}_{\\text{a}}} of the as-obtained films is determined from Raman spectra and lies between 1.74 and 2.67 nm. The film uniformity was further confirmed by Raman mapping. The sheet resistance {{R}_{\\text{sq}}} of 3.73 \\text{k}\\Omega and charge carrier mobility μ of 2.49\\;\\text{c}{{\\text{m}}^{2}}\\;{{\\text{V}}^{-1}}\\;{{\\text{s}}^{-1}} are measured. We show that the NCG films can be readily patterned by reactive ion etching. NCG is also successfully deposited onto quartz and sapphire substrates and showed >85% optical transparency in the visible light spectrum.

  10. Enhanced stability of Cu-BTC MOF via perfluorohexane plasma-enhanced chemical vapor deposition.

    PubMed

    Decoste, Jared B; Peterson, Gregory W; Smith, Martin W; Stone, Corinne A; Willis, Colin R

    2012-01-25

    Metal organic frameworks (MOFs) are a leading class of porous materials for a wide variety of applications, but many of them have been shown to be unstable toward water. Cu-BTC (1,3,5 benzenetricarboxylic acid, BTC) was treated with a plasma-enhanced chemical vapor deposition (PECVD) of perfluorohexane creating a hydrophobic form of Cu-BTC. It was found that the treated Cu-BTC could withstand high humidity and even submersion in water much better than unperturbed Cu-BTC. Through Monte Carlo simulations it was found that perfluorohexane sites itself in such a way within Cu-BTC as to prevent the formation of water clusters, hence preventing the decomposition of Cu-BTC by water. This PECVD of perfluorohexane could be exploited to widen the scope of practical applications of Cu-BTC and other MOFs. PMID:22239201

  11. Strongly enhanced photoluminescence in nanostructured monolayer MoS2 by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Zhu, Yi; Yang, Jiong; Zhang, Shuang; Mokhtar, Salman; Pei, Jiajie; Wang, Xinghua; Lu, Yuerui

    2016-04-01

    Two-dimensional (2D) layered molybdenum disulfide (MoS2) has become a very promising candidate semiconducting material for future optoelectronic devices, owing to its unique properties. However, monolayer MoS2 is still a weak photon emitter, compared with other direct band gap semiconductors, which requires extra techniques or complicated steps to enhance its photon emission efficiency. Here, we demonstrated that nanostructured monolayer MoS2, produced by one-step chemical vapor deposition (CVD) growth, shows highly enhanced PL emission. The effective enhancement factor could be up to ∼43. Our results open the door to manipulating the optical properties of future devices by using nanostructured 2D monolayers.

  12. Chemical vapor deposition graphene as structural template to control interfacial molecular orientation of chloroaluminium phthalocyanine

    NASA Astrophysics Data System (ADS)

    Ying Mao, Hong; Wang, Rui; Wang, Yu; Chao Niu, Tian; Qiang Zhong, Jian; Yang Huang, Ming; Chen Qi, Dong; Ping Loh, Kian; Thye Shen Wee, Andrew; Chen, Wei

    2011-08-01

    Chemical vapor deposition (CVD) graphene has been used as an effective structural template to manipulate molecular orientation of organic thin film of chloroaluminium phthalocyanine (ClAlPc) on indium tin oxide (ITO) electrode. As revealed by in-situ near-edge x-ray adsorption fine structure measurement, ClAlPc molecules on the CVD graphene modified ITO electrode adopt a well-aligned lying-down configuration with their molecular π-plane nearly parallel to the electrode surface, in contrast to the random orientation of ClAlPc molecules on the bare ITO electrode. This lying-down configuration results in an optimized stacking of the molecular π-plane perpendicular to the electrode surface and hence facilitates efficient charge transport along this direction.

  13. Carbon K edge spectroscopy of internal interface and defect states of chemical vapor deposited diamond films

    SciTech Connect

    Nithianandam, J.; Rife, J.C. ); Windischmann, H. )

    1992-01-06

    We have made carbon {ital K} edge reflectivity and absorption measurements using synchrotron radiation on diamond crystals and chemical vapor deposited diamond films to determine their electronic structures. Our spectra of diamond films show that both {ital sp}{sup 2} and {ital sp}{sup 3} bonded carbon atoms are formed during initial nucleation and growth. Transmission spectra of a diamond film with 30 nm diameter cystallites show striking features below the carbon {ital sp}{sup 3} {ital K} edge due to internal interface states and/or defects. We compare these absorption features to x-ray absorption spectra of clean diamond (111) surface, graphite, and hydrocarbon gases to understand surface chemistry involved in the deposition process.

  14. Nanosoldering carbon nanotube junctions by local chemical vapor deposition for improved device performance.

    PubMed

    Do, Jae-Won; Estrada, David; Xie, Xu; Chang, Noel N; Mallek, Justin; Girolami, Gregory S; Rogers, John A; Pop, Eric; Lyding, Joseph W

    2013-01-01

    The performance of carbon nanotube network (CNN) devices is usually limited by the high resistance of individual nanotube junctions (NJs). We present a novel method to reduce this resistance through a nanoscale chemical vapor deposition (CVD) process. By passing current through the devices in the presence of a gaseous CVD precursor, localized nanoscale Joule heating induced at the NJs stimulates the selective and self-limiting deposition of metallic nanosolder. The effectiveness of this nanosoldering process depends on the work function of the deposited metal (here Pd or HfB2), and it can improve the on/off current ratio of a CNN device by nearly an order of magnitude. This nanosoldering technique could also be applied to other device types where nanoscale resistance components limit overall device performance. PMID:24215439

  15. Growth of FePt encapsulated carbon nanotubes by thermal chemical vapor deposition

    SciTech Connect

    Fujiwara, Yuji Kaneko, Tetsuya; Hori, Kenta; Takase, Sho; Sato, Hideki; Maeda, Kohji; Kobayashi, Tadashi; Kato, Takeshi; Iwata, Satoshi; Jimbo, Mutsuko

    2014-03-15

    FePt encapsulated carbon nanotubes (CNTs) were grown by thermal chemical vapor deposition using an Fe/Pt bilayer catalyst. The CNTs were grown according to the base growth model. Selected area electron diffraction results revealed that the encapsulated particles were A1-FePt, L1{sub 0}-FePt, and Fe{sub 3}PtC. The crystal structures of particles found at the root parts of CNTs were not able to be identified, however. The layered structure of catalytic films seemed to be responsible for the difference in Pt content between particles found at tip and root parts of CNTs. Approximately 60% of CNTs grown at 800 °C had particles at their tip parts, compared to only 30% when the growth temperature was 700 °C, indicating that higher process temperatures promote particle encapsulation in CNTs.

  16. Carbon nanowalls grown by microwave plasma enhanced chemical vapor deposition during the carbonization of polyacrylonitrile fibers

    SciTech Connect

    Li Jiangling; Su Shi; Kundrat, Vojtech; Abbot, Andrew M.; Ye, Haitao; Zhou Lei; Mushtaq, Fajer; Ouyang Defang; James, David; Roberts, Darren

    2013-01-14

    We used microwave plasma enhanced chemical vapor deposition (MPECVD) to carbonize an electrospun polyacrylonitrile (PAN) precursor to form carbon fibers. Scanning electron microscopy, Raman spectroscopy, and Fourier transform infrared spectroscopy were used to characterize the fibers at different evolution stages. It was found that MPECVD-carbonized PAN fibers do not exhibit any significant change in the fiber diameter, whilst conventionally carbonized PAN fibers show a 33% reduction in the fiber diameter. An additional coating of carbon nanowalls (CNWs) was formed on the surface of the carbonized PAN fibers during the MPECVD process without the assistance of any metallic catalysts. The result presented here may have a potential to develop a novel, economical, and straightforward approach towards the mass production of carbon fibrous materials containing CNWs.

  17. Modification of tubular ceramic membranes with carbon nanotubes using catalytic chemical vapor deposition.

    PubMed

    Tran, Duc Trung; Thieffry, Guillemette; Jacob, Matthieu; Batiot-Dupeyrat, Catherine; Teychene, Benoit

    2015-01-01

    In this study, carbon nanotubes (CNTs) were successfully grown on tubular ceramic membranes using the catalytic chemical vapor deposition (CCVD) method. CNTs were synthesized at 650°C for 3-6 h under a 120 mL min(-1) flow of C2H6 on ceramic membranes impregnated with iron salt. The synthesis procedure was beforehand optimized in terms of catalyst amount, impregnation duration and reaction temperature, using small pieces of tubular ceramic membranes. The yield, size and structure of the CNTs produced were characterized using thermogravimetric analysis and microscopic imaging techniques. Afterwards, preliminary filtration tests with alginate and phenol were performed on two modified tubular membranes. The results indicate that the addition of CNTs on the membrane material increased the permeability of ceramic membrane and its ability to reject alginate and adsorb phenol, yet decreased its fouling resistance. PMID:26465312

  18. Study of surface morphology and alignment of MWCNTs grown by chemical vapor deposition

    SciTech Connect

    Shukrullah, S. E-mail: noranimuti-mohamed@petronas.com.my Mohamed, N. M. E-mail: noranimuti-mohamed@petronas.com.my Shaharun, M. S. E-mail: noranimuti-mohamed@petronas.com.my; Yasar, M.

    2014-10-24

    In this research work, Multiwalled Carbon Nanotubes (MWCNTs) have been synthesized successfully by using floating catalytic chemical vapor deposition (FCCVD) method. Different ferrocene amounts (0.1, 0.125 and 0.15 g) were used as catalyst and ethylene was used as a carbon precursor at reaction temperature of 800°C. Characterization of the grown MWCNTs was carried out by using scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The obtained data showed that the catalyst weight affects the nanotubes diameter, alignment, crystallinity and growth significantly, whereas negligible influence was noticed on CNTs forest length. The dense, uniform and meadow like patterns of grown CNTs were observed for 0.15 g ferrocene. The average diameter of the grown CNTs was found in the range of 32 to 75 nm. Close inspection of the TEM images also confirmed the defects in some of the grown CNTs, where few black spots were evident in CNTs structure.

  19. Optimization of the chemical vapor deposition process for fabrication of carbon nanotube/Al composite powders

    SciTech Connect

    He, C.N.; Zhao, N.Q.; Shi, C.S.; Song, S.Z.

    2010-09-15

    In order to optimize the chemical vapor deposition process for fabrication of carbon nanotube/Al composite powders, the effect of different reaction conditions (such as reaction temperature, reaction time, and reaction gas ratio) on the morphological and structural development of the powder and dispersion of CNTs in Al powder was investigated using transmission electron microscope. The results showed that low temperatures (500-550 {sup o}C) give rise to herringbone-type carbon nanofibers and high temperatures (600-630 {sup o}C) lead to multi-walled CNTs. Long reaction times broaden the CNT size distribution and increase the CNT yield. Appropriate nitrogen flow is preferred for CNT growth, but high and low nitrogen flow result in carbon nanospheres and CNTs with coarse surfaces, respectively. Above results show that appropriate parameters are effective in dispersing the nanotubes in the Al powder which simultaneously protects the nanotubes from damage.

  20. Growth of aligned carbon nanotubes on carbon microfibers by dc plasma-enhanced chemical vapor deposition

    SciTech Connect

    Chen, L H.; AuBuchon, J F.; Chen, I C.; Daraio, C; Ye, X R.; Gapin, A; Jin, Sungho; Wang, Chong M.

    2006-01-16

    It is shown that unidirectionally aligned carbon nanotubes can be grown on electrically conductive network of carbon microfibers via control of buffer layer material and applied electric field during dc plasma chemical vapor deposition growth. Ni catalyst deposition on carbon microfiber produces relatively poorly aligned nanotubes with significantly varying diameters and lengths obtained. The insertion of Ti 5 nm thick underlayer between Ni catalyst layer and C microfiber substrate significantly alters the morphology of nanotubes, resulting in much better aligned, finer diameter, and longer array of nanotubes. This beneficial effect is attributed to the reduced reaction between Ni and carbon paper, as well as prevention of plasma etching of carbon paper by inserting a Ti buffer layer. Such a unidirectionally aligned nanotube structure on an open-pore conductive substrate structure may conveniently be utilized as a high-surface-area base electrodes for fuel cells, batteries, and other electrochemical and catalytic reactions.

  1. Vertically aligned boron nitride nanosheets: chemical vapor synthesis, ultraviolet light emission, and superhydrophobicity.

    PubMed

    Yu, Jie; Qin, Li; Hao, Yufeng; Kuang, Shengyong; Bai, Xuedong; Chong, Yat-Ming; Zhang, Wenjun; Wang, Enge

    2010-01-26

    Boron nitride (BN) is a promising semiconductor with a wide band gap ( approximately 6 eV). Here, we report the synthesis of vertically aligned BN nanosheets (BNNSs) on silicon substrates by microwave plasma chemical vapor deposition from a gas mixture of BF(3)-N(2)-H(2). The size, shape, thickness, density, and alignment of the BNNSs were well-controlled by appropriately changing the growth conditions. With changing the gas flow rates of BF(3) and H(2) as well as their ratio, the BNNSs evolve from three-dimensional with branches to two-dimensional with smooth surface and their thickness changes from 20 to below 5 nm. The growth of the BNNSs rather than uniform granular films is attributed to the particular chemical properties of the gas system, mainly the strong etching effect of fluorine. The alignment of the BNNSs is possibly induced by the electrical field generated in plasma sheath. Strong UV light emission with a broad band ranging from 200 to 400 nm and superhydrophobicity with contact angles over 150 degrees were obtained for the vertically aligned BNNSs. The present BNNSs possess the properties complementary to carbon nanosheets such as intrinsically semiconducting, high temperature stability, and high chemical inertness and may find applications in ultraviolet nanoelectronics, catalyst supports, electron field emission, and self-cleaning coatings, etc., especially those working at high temperature and in harsh environments. PMID:20047271

  2. Synthesis of multiferroic Er-Fe-O thin films by atomic layer and chemical vapor deposition

    SciTech Connect

    Mantovan, R. Vangelista, S.; Wiemer, C.; Lamperti, A.; Tallarida, G.; Chikoidze, E.; Dumont, Y.; Fanciulli, M.

    2014-05-07

    R-Fe-O (R = rare earth) compounds have recently attracted high interest as potential new multiferroic materials. Here, we report a method based on the solid-state reaction between Er{sub 2}O{sub 3} and Fe layers, respectively grown by atomic layer deposition and chemical vapor deposition, to synthesize Er-Fe-O thin films. The reaction is induced by thermal annealing and evolution of the formed phases is followed by in situ grazing incidence X-ray diffraction. Dominant ErFeO{sub 3} and ErFe{sub 2}O{sub 4} phases develop following subsequent thermal annealing processes at 850 °C in air and N{sub 2}. Structural, chemical, and morphological characterization of the layers are conducted through X-ray diffraction and reflectivity, time-of-flight secondary ion-mass spectrometry, and atomic force microscopy. Magnetic properties are evaluated by magnetic force microscopy, conversion electron Mössbauer spectroscopy, and vibrating sample magnetometer, being consistent with the presence of the phases identified by X-ray diffraction. Our results constitute a first step toward the use of cost-effective chemical methods for the synthesis of this class of multiferroic thin films.

  3. Computational Study of Fluid Flow in a Rotational Chemical Vapor Deposition (CVD) Reactor

    NASA Astrophysics Data System (ADS)

    Wong, Sun; Jaluria, Yogesh

    2015-11-01

    In a typical Chemical Vapor Deposition (CVD) reactor, the flow of the reacting gases is one of the most important considerations that must be precisely controlled in order to obtain desired film quality. In general, the fluids enter the reactor chamber, travel over to the heated substrate area, where chemical reactions lead to deposition, and then exit the chamber. However, the flow inside the reactor chamber is not that simple. It would often develop recirculation at various locations inside the reactor due to reactor geometry, flow conditions, buoyancy effects from temperature differences and rotational effects cause by the rotating substrate. This recirculation causes hot spots and affects the overall performance of the reactor. A recirculation fluid packet experiences a longer residence time inside the reactor and, thus, it heats up to higher temperatures causing unwanted chemical reactions and decomposition. It decreases the grow rate and uniformity on the substrate. A mathematical and computational model has been developed to help identify these unwanted hot spots occurring inside the CVD reactor. The model can help identify the user parameters needed to reduce the recirculation effects and better control the flow. Flow rates, pressures, rotational speeds and temperatures can all affect the severity of the recirculation within the reactor. The model can also help assist future designs as the geometry plays a big role in controlling fluid flow. The model and the results obtained are discussed in detail.

  4. Ultralow-k silicon containing fluorocarbon films prepared by plasma-enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Jin, Yoonyoung; Ajmera, P. K.; Lee, G. S.; Singh, Varshni

    2005-09-01

    Low dielectric constant materials as interlayer dielectrics (ILDs) offer a way to reduce the RC time delay in high-performance ultra-large-scale integration (ULSI) circuits. Fluorocarbon films containing silicon have been developed for interlayer applications below 50-nm linewidth technology. The preparation of the films was carried out by plasma-enhanced chemical vapor deposition (PECVD) using gas precursors of tetrafluorocarbon as the source of active species and disilane (5 vol.% in helium) as a reducing agent to control the ratio of F/C in the films. The basic properties of the low dielectric constant (low-k) interlayer dielectric films are studied as a function of the fabrication process parameters. The electrical, mechanical, chemical, and thermal properties were evaluated including dielectric constant, surface planarity, hardness, residual stress, chemical bond structure, and shrinkage upon heat treatments. The deposition process conditions were optimized for film thermal stability while maintaining a relative dielectric value as low as 2.0. The average breakdown field strength was 4.74 MV/cm. The optical energy gap was in the range 2.2 2.4 eV. The hardness and residual stress in the optimized processed SiCF films were, respectively, measured to be in the range 1.4 1.78 GPa and in the range 11.6 23.2 MPa of compressive stress.

  5. Development of aerosol assisted chemical vapor deposition for thin film fabrication

    NASA Astrophysics Data System (ADS)

    Maulana, Dwindra Wilham; Marthatika, Dian; Panatarani, Camellia; Mindara, Jajat Yuda; Joni, I. Made

    2016-02-01

    Chemical vapor deposition (CVD) is widely used to grow a thin film applied in many industrial applications. This paper report the development of an aerosol assisted chemical vapor deposition (AACVD) which is one of the CVD methods. Newly developed AACVD system consists of a chamber of pyrex glass, two wire-heating elements placed to cover pyrex glass, a substrate holder, and an aerosol generator using an air brush sprayer. The temperature control system was developed to prevent condensation on the chamber walls. The control performances such as the overshoot and settling time were obtained from of the developed temperature controller. Wire-heating elements were controlled at certain setting value to heat the injected aerosol to form a thin film in the substrate. The performance of as-developed AACVD system tested to form a thin film where aerosol was sprayed into the chamber with a flow rate of 7 liters/minutes, and vary in temperatures and concentrations of precursor. The temperature control system have an overshoot around 25 °C from the desired set point temperature, very small temperature ripple 2 °C and a settling time of 20 minutes. As-developed AACVD successfully fabricated a ZnO thin film with thickness of below 1 µm. The performances of system on formation of thin films influenced by the generally controlled process such as values of setting temperature and concentration where the aerosol flow rate was fixed. Higher temperature was applied, the more uniform ZnO thin films were produced. In addition, temperature of the substrate also affected on surface roughness of the obtained films, while concentration of ZnO precursor determined the thickness of produce films. It is concluded that newly simple AACVD can be applied to produce a thin film.

  6. Fracture toughness of low-pressure chemical-vapor-deposited polycrystalline silicon carbide thin films

    NASA Astrophysics Data System (ADS)

    Hatty, V.; Kahn, H.; Trevino, J.; Zorman, C. A.; Mehregany, M.; Ballarini, R.; Heuer, A. H.

    2006-01-01

    The fracture toughness of thin-film polycrystalline silicon carbide (poly-SiC) deposited on silicon (Si) wafers via low-pressure chemical-vapor deposition (LPCVD) has been measured on a scale useful for micromachined devices; the results are compared to previous studies on poly-SiC thin films deposited by atmospheric pressure chemical-vapor deposition (APCVD) [Bellante et al., Appl. Phys. Lett. 86, 071920 (2005)]. Samples in this study included those with and without silicon dioxide (SiO2) sacrificial release layers. The LPCVD processing technique induces residual tensile stresses in the films. Doubly clamped microtensile specimens were fabricated using standard micromachining processes, and microindentation was used to initiate atomically sharp precracks. The residual stresses in the films create stress intensity factors K at the crack tips; upon release, the precracks whose K exceeded a critical value, KIC, propagated to failure. The fracture toughness KIC was the same for both types of devices, 2.9+/-0.2 MPa m1/2 for the SiC on Si samples and 3.0+/-0.2 MPa m1/2 for the SiC on SiO2/Si samples, and similar to that found for APCVD poly-SiC, 2.8<=KIC<=3.4 MPa m1/2 [Bellante et al., Appl. Phys. Lett. 86, 071920 (2005)], indicating that KIC is truly a structure-insensitive material property. The fracture toughness of poly-SiC compares favorably with that for polysilicon, 0.85+/-0.05 MPa m1/2 [Kahn et al., Science 298, 1215 (2002)].

  7. Comprehensive investigation of HgCdTe metalorganic chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Raupp, Gregory B.

    1993-01-01

    The principal objective of this experimental and theoretical research program was to explore the possibility of depositing high quality epitaxial CdTe and HgCdTe at very low pressures through metalorganic chemical vapor deposition (MOCVD). We explored two important aspects of this potential process: (1) the interaction of molecular flow transport and deposition in an MOCVD reactor with a commercial configuration, and (2) the kinetics of metal alkyl source gas adsorption, decomposition and desorption from the growing film surface using ultra high vacuum surface science reaction techniques. To explore the transport-reaction issue, we have developed a reaction engineering analysis of a multiple wafer-in-tube ultrahigh vacuum chemical vapor deposition (UHV/CVD) reactor which allows an estimate of wafer or substrate throughput for a reactor of fixed geometry and a given deposition chemistry with specified film thickness uniformity constraints. The model employs a description of ballistic transport and reaction based on the pseudo-steady approximation to the Boltzmann equation in the limit of pure molecular flow. The model representation takes the form of an integral equation for the flux of each reactant or intermediate species to the wafer surfaces. Expressions for the reactive sticking coefficients (RSC) for each species must be incorporated in the term which represents reemission from a wafer surface. The interactions of MOCVD precursors with Si and CdTe were investigated using temperature programmed desorption (TPD) in ultra high vacuum combined with Auger electron spectroscopy (AES). These studies revealed that diethyltellurium (DETe) and dimethylcadmium (DMCd) adsorb weakly on clean Si(100) and desorb upon heating without decomposing. These precursors adsorb both weakly and strongly on CdTe(111)A, with DMCd exhibiting the stronger interaction with the surface than DETe.

  8. Growth, delta-doping and characterization of diamond films by hot filament chemical vapor deposition method

    NASA Astrophysics Data System (ADS)

    Mtengi, Bokani

    The synthesis of high-quality heteroepitaxial diamond films continues to attract interesting research possibilities for the development of diamond devices. Diamond has great properties; mechanical, optical, electrical and its natural impurities that can be explored for various applications. The color centers are widely recognized as promising solid-state platform for quantum computing applications. We report successful heteroepitaxial growth and delta doping of color centers in hot filament chemical vapor deposited diamond films composed of nitrogen, germanium and silicon indicated by the strong photoluminescence intensity peaks obtained using the confocal microscope. We studied the effect of hot-filament chemical vapor deposition conditions on the quality of diamond films grown on silicon and silicon carbide substrates. The effect of substrate distance, the methane (CH4) and hydrogen (H2) gases flow rates and ratios, substrate growth and filament temperature, growth time and growth termination procedures on diamond film quality are discussed. The relatively good quality of these films was confirmed by several spectroscopic techniques including, Raman spectroscopy that gave insights into the relative sp2/sp3 bonding configurations, the residual strain and the crystalline quality. The scanning electron microscopy (SEM) was used to examine the grain size and morphology. In-situ growth monitoring was studied using the laser reflectance interferometer (LRI) tool, which provides data for thickness, growth rate measurements and guidance for nitrogen doping. Optimal growth conditions that lead to synthesis of high quality heteroepitaxial diamond layer at growth rate of 0.5microm/hr were determined. The delta-doped samples have been analyzed using the confocal optical microscope to measure their spin-dependent photoluminescence intensity (IPL). Electrical properties of the undoped diamond films have been measured using the Hall effects measurement for resistivity and

  9. Plasma-enhanced chemical vapor deposited silicon carbide as an implantable dielectric coating.

    PubMed

    Cogan, Stuart F; Edell, David J; Guzelian, Andrew A; Ping Liu, Ying; Edell, Robyn

    2003-12-01

    Amorphous silicon carbide (a-SiC) films, deposited by plasma-enhanced chemical vapor deposition (PECVD), have been evaluated as insulating coatings for implantable microelectrodes. The a-SiC was deposited on platinum or iridium wire for measurement of electrical leakage through the coating in phosphate-buffered saline (PBS, pH 7.4). Low leakage currents of <10(-11) A were observed over a +/-5-V bias. The electronic resistivity of a-SiC was 3 x 10(13) Omega-cm. Dissolution rates of a-SiC in PBS at 37 and 90 degrees C were determined from changes in infrared absorption band intensities and compared with those of silicon nitride formed by low-pressure chemical vapor deposition (LPCVD). Dissolution rates of LPCVD silicon nitride were 2 nm/h and 0.4 nm/day at 90 and 37 degrees C, respectively, while a-SiC had a dissolution rate of 0.1 nm/h at 90 degrees C and no measurable dissolution at 37 degrees C. Biocompatibility was assessed by implanting a-SiC-coated quartz discs in the subcutaneous space of the New Zealand White rabbit. Histological evaluation showed no chronic inflammatory response and capsule thickness was comparable to silicone or uncoated quartz controls. Amorphous SiC-coated microelectrodes were implanted in the parietal cortex for periods up to 150 days and the cortical response evaluated by histological evaluation of neuronal viability at the implant site. The a-SiC was more stable in physiological saline than LPCVD Si(3)N(4) and well tolerated in the cortex. PMID:14613234

  10. Chemical vapor deposition of refractory ternary nitrides for advanced diffusion barriers

    SciTech Connect

    Custer, Jonathan S.; Fleming, James G.; Roherty-Osmun, Elizabeth; Smith, Paul Martin

    1998-09-22

    Refractory ternary nitride films for diffusion barriers in microelectronics have been grown using chemical vapor deposition. Thin films of titanium-silicon-nitride, tungsten-boron-nitride, and tungsten-silicon-nitride of various compositions have been deposited on 150 mm Si wafers. The microstructure of the films are either fully amorphous for the tungsten based films, or nauocrystalline TiN in an amorphous matrix for titanium-silicon-nitride. All films exhibit step coverages suitable for use in future microelectronics generations. Selected films have been tested as diffusion barriers between copper and silicon, and generally perform extremely weH. These fiIms are promising candidates for advanced diffusion barriers for microelectronics applications. The manufacturing of silicon wafers into integrated circuits uses many different process and materials. The manufacturing process is usually divided into two parts: the front end of line (FEOL) and the back end of line (BEOL). In the FEOL the individual transistors that are the heart of an integrated circuit are made on the silicon wafer. The responsibility of the BEOL is to wire all the transistors together to make a complete circuit. The transistors are fabricated in the silicon itself. The wiring is made out of metal, currently aluminum and tungsten, insulated by silicon dioxide, see Figure 1. Unfortunately, silicon will diffuse into aluminum, causing aluminum spiking of junctions, killing transistors. Similarly, during chemical vapor deposition (CVD) of tungsten from ~fj, the reactivity of the fluorine can cause "worn-holes" in the silicon, also destroying transistors. The solution to these problems is a so-called diffusion barrier, which will allow current to pass from the transistors to the wiring, but will prevent reactions between silicon and the metal.

  11. Synthesis of nanoscale materials via a novel chemical vapor deposition based apparatus

    NASA Astrophysics Data System (ADS)

    Klug, Kevin L.

    Nanoscale materials are of interest due to the unusual properties afforded by their size. Two such morphologies, nanoparticles and the recently discovered "nanobelt" materials, are explored in this thesis. A novel nanoscale material synthesis apparatus was constructed. It consists of four primary components: an evaporation chamber, a chemical vapor deposition furnace, a collection chamber, and a powder reservoir. A two-stage subsonic jet separates the first two components, permitting nanoparticle production to occur independently of subsequent chemical and thermal treatment. An experimental design was conducted to examine the roles of several variables during the formation of graphite-encapsulated nickel nanoparticles. Coating morphology was strongly dependent on furnace temperature, which exhibited a more subtle influence on mean particle size. The percentage of nickel surviving acid treatment depended primarily on hydrocarbon identity, as well as furnace temperature and carbon atom flux. Acetylene at high temperature yielded crystalline carbon coatings and the greatest percentage of protected nickel achieved, but with an excess of carbon in the product. Additional encapsulated nickel experiments were conducted with reduced acetylene flowrates and a staggered furnace temperature. Thermogravimetric analysis of the as-collected powder revealed that the coating was a crystalline and amorphous carbon hybrid. While this coating effectively protected large clumps of embedded nickel, removal of the amorphous carbon by oxidation rendered individual particles susceptible to hydrochloric acid attack. Amorphous silica was introduced as an alternative coating material via tetraethoxysilane decomposition. Transmission electron microscopy confirmed the production of well-dispersed, acid-resistant particles with a nickel core and silica shell. The synthesis of nanoscale alumina heterogeneous catalyst substrates was investigated. Exposure of aluminum nanoparticles to large

  12. Dynamics of chemical vapor sensing with MoS2 using 1T/2H phase contacts/channel.

    PubMed

    Friedman, Adam L; Perkins, F Keith; Hanbicki, Aubrey T; Culbertson, James C; Campbell, Paul M

    2016-06-01

    Ultra-thin transition metal dichalcogenides (TMDs) films show remarkable potential for use in chemical vapor sensing devices. Electronic devices fabricated from TMD films are inexpensive, inherently flexible, low-power, amenable to industrial-scale processing because of emergent growth techniques, and have shown high sensitivity and selectivity to electron donor analyte molecules important for explosives and nerve gas detection. However, for devices reported to date, the conductance response to chemical vapors is dominated by Schottky contacts, to the detriment of the sensitivity, selectivity, recovery, and obscuring their intrinsic behavior. Here, we use contact engineering to transition the contacts in a MoS2 FET-based chemical vapor sensor to the 1T conducting phase, while leaving the channel in the 2H semiconducting state, and thus providing Ohmic contacts to the film. We demonstrate that the resultant sensors have much improved electrical characteristics, are more selective, and recover fully after chemical vapor exposure-all major enhancements to previously MoS2 sensor devices. We identify labile nitrogen-containing electron donors as the primary species that generate a response in MoS2, and we study the dynamics of the sensing reactions, identifying two possible qualitative models for the chemical sensing reaction. PMID:27194452

  13. Dynamics of chemical vapor sensing with MoS2 using 1T/2H phase contacts/channel

    NASA Astrophysics Data System (ADS)

    Friedman, Adam L.; Perkins, F. Keith; Hanbicki, Aubrey T.; Culbertson, James C.; Campbell, Paul M.

    2016-06-01

    Ultra-thin transition metal dichalcogenides (TMDs) films show remarkable potential for use in chemical vapor sensing devices. Electronic devices fabricated from TMD films are inexpensive, inherently flexible, low-power, amenable to industrial-scale processing because of emergent growth techniques, and have shown high sensitivity and selectivity to electron donor analyte molecules important for explosives and nerve gas detection. However, for devices reported to date, the conductance response to chemical vapors is dominated by Schottky contacts, to the detriment of the sensitivity, selectivity, recovery, and obscuring their intrinsic behavior. Here, we use contact engineering to transition the contacts in a MoS2 FET-based chemical vapor sensor to the 1T conducting phase, while leaving the channel in the 2H semiconducting state, and thus providing Ohmic contacts to the film. We demonstrate that the resultant sensors have much improved electrical characteristics, are more selective, and recover fully after chemical vapor exposure--all major enhancements to previously MoS2 sensor devices. We identify labile nitrogen-containing electron donors as the primary species that generate a response in MoS2, and we study the dynamics of the sensing reactions, identifying two possible qualitative models for the chemical sensing reaction.

  14. Comparison between chemical vapor deposited and physical vapor deposited WSi2 metal gate for InGaAs n-metal-oxide-semiconductor field-effect transistors

    NASA Astrophysics Data System (ADS)

    Ong, B. S.; Pey, K. L.; Ong, C. Y.; Tan, C. S.; Antoniadis, D. A.; Fitzgerald, E. A.

    2011-05-01

    We compare chemical vapor deposition (CVD) and physical vapor deposition (PVD) WSi2 metal gate process for In0.53Ga0.47As n-metal-oxide-semiconductor field-effect transistors using 10 and 6.5 nm Al2O3 as dielectric layer. The CVD-processed metal gate device with 6.5 nm Al2O3 shows enhanced transistor performance such as drive current, maximum transconductance and maximum effective mobility. These values are relatively better than the PVD-processed counterpart device with improvement of 51.8%, 46.4%, and 47.8%, respectively. The improvement for the performance of the CVD-processed metal gate device is due to the fluorine passivation at the oxide/semiconductor interface and a nondestructive deposition process.

  15. Infiltrative Cardiomyopathies

    PubMed Central

    Bejar, David; Colombo, Paolo C; Latif, Farhana; Yuzefpolskaya, Melana

    2015-01-01

    Infiltrative cardiomyopathies can result from a wide spectrum of both inherited and acquired conditions with varying systemic manifestations. They portend an adverse prognosis, with only a few exceptions (ie, glycogen storage disease), where early diagnosis can result in potentially curative treatment. The extent of cardiac abnormalities varies based on the degree of infiltration and results in increased ventricular wall thickness, chamber dilatation, and disruption of the conduction system. These changes often lead to the development of heart failure, atrioventricular (AV) block, and ventricular arrhythmia. Because these diseases are relatively rare, a high degree of clinical suspicion is important for diagnosis. Electrocardiography and echocardiography are helpful, but advanced techniques including cardiac magnetic resonance (CMR) and nuclear imaging are increasingly preferred. Treatment is dependent on the etiology and extent of the disease and involves medications, device therapy, and, in some cases, organ transplantation. Cardiac amyloid is the archetype of the infiltrative cardiomyopathies and is discussed in great detail in this review. PMID:26244036

  16. Plasma Surface Chemical Treatment of Electrospun Poly(l-Lactide) Microfibrous Scaffolds for Enhanced Cell Adhesion, Growth, and Infiltration

    PubMed Central

    Cheng, Qian; Lee, Benjamin Li-Ping; Yan, Zhiqiang; Li, Song

    2013-01-01

    Poly(l-lactide) (PLLA) microfibrous scaffolds produced by electrospinning were treated with mild Ar or Ar-NH3/H2 plasmas to enhance cell attachment, growth, and infiltration. Goniometry, atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS) measurements were used to evaluate the modification of the scaffold surface chemistry by plasma treatment. AFM and XPS measurements showed that both plasma treatments increased the hydrophilicity without affecting the integrity of the fibrous structure and the fiber roughness, whereas Ar-NH3/H2 plasma treatment also resulted in surface functionalization with amine groups. Culture studies of bovine aorta endothelial cells and bovine smooth muscle cells on the plasma-treated PLLA scaffolds revealed that both Ar and Ar-NH3/H2 plasma treatments promoted cell spreading during the initial stage of cell attachment and, more importantly, increased the cell growth rate, especially for Ar plasma treatment. In vitro cell infiltration studies showed that both plasma treatments effectively enhanced cell migration into the microfibrous scaffolds. In vivo experiments involving the subcutaneous implantation of plasma-treated PLLA scaffolds under the skin of Sprague-Dawley rats also showed increased cell infiltration. The results of this study indicate that surface treatment of PLLA microfibrous scaffolds with mild Ar or Ar-NH3/H2 plasmas may have important implications in tissue engineering. Further modifications with bioactive factors should improve the functions of the scaffolds for specific applications. PMID:23281641

  17. Control of interface nanoscale structure created by plasma-enhanced chemical vapor deposition.

    PubMed

    Peri, Someswara R; Akgun, Bulent; Satija, Sushil K; Jiang, Hao; Enlow, Jesse; Bunning, Timothy J; Foster, Mark D

    2011-09-01

    Tailoring the structure of films deposited by plasma-enhanced chemical vapor deposition (PECVD) to specific applications requires a depth-resolved understanding of how the interface structures in such films are impacted by variations in deposition parameters such as feed position and plasma power. Analysis of complementary X-ray and neutron reflectivity (XR, NR) data provide a rich picture of changes in structure with feed position and plasma power, with those changes resolved on the nanoscale. For plasma-polymerized octafluorocyclobutane (PP-OFCB) films, a region of distinct chemical composition and lower cross-link density is found at the substrate interface for the range of processing conditions studied and a surface layer of lower cross-link density also appears when plasma power exceeds 40 W. Varying the distance of the feed from the plasma impacts the degree of cross-linking in the film center, thickness of the surface layer, and thickness of the transition region at the substrate. Deposition at the highest power, 65 W, both enhances cross-linking and creates loose fragments with fluorine content higher than the average. The thickness of the low cross-link density region at the air interface plays an important role in determining the width of the interface built with a layer subsequently deposited atop the first. PMID:21875044

  18. Diagnostic Techniques Used to Study Chemical-Vapor-Deposited Diamond Films

    NASA Technical Reports Server (NTRS)

    Miyoshi, Kazuhisa

    2000-01-01

    The advantages and utility of chemical-vapor-deposited (CVD) diamond as an industrial ceramic can only be realized if the price and quality are right. Until recently, this technology was of interest only to the academic and basic research community. However, interest has grown because of advances made by leading CVD diamond suppliers: 1) Reduction of the cost of CVD polycrystalline diamond deposition below $5/carat ($8/sq cm); 2) Installation of production capacity; 3) Epitaxial growth of CVD single-crystal diamond. Thus, CVD diamond applications and business are an industrial reality. At present, CVD diamond is produced in the form of coatings or wafers. CVD diamond film technology offers a broader technological potential than do natural and high-pressure synthetic diamonds because size, geometry, and eventually cost will not be as limiting. Now that they are cost effective, diamond coatings - with their extreme properties - can be used in a variety of applications. Diamond coatings can improve many of the surface properties of engineering substrate materials, including erosion, corrosion, and wear resistance. Examples of actual and potential applications, from microelectromechanical systems to the wear parts of diamond coatings and related superhard coatings are described. For example, diamond coatings can be used as a chemical and mechanical barrier for the space shuttles check valves, particularly on the guide pins and seat assemblies.

  19. Chemical vapor deposition-derived graphene with electrical performance of exfoliated graphene.

    PubMed

    Petrone, Nicholas; Dean, Cory R; Meric, Inanc; van der Zande, Arend M; Huang, Pinshane Y; Wang, Lei; Muller, David; Shepard, Kenneth L; Hone, James

    2012-06-13

    While chemical vapor deposition (CVD) promises a scalable method to produce large-area graphene, CVD-grown graphene has heretofore exhibited inferior electronic properties in comparison with exfoliated samples. Here we test the electrical transport properties of CVD-grown graphene in which two important sources of disorder, namely grain boundaries and processing-induced contamination, are substantially reduced. We grow CVD graphene with grain sizes up to 250 μm to abate grain boundaries, and we transfer graphene utilizing a novel, dry-transfer method to minimize chemical contamination. We fabricate devices on both silicon dioxide and hexagonal boron nitride (h-BN) dielectrics to probe the effects of substrate-induced disorder. On both substrate types, the large-grain CVD graphene samples are comparable in quality to the best reported exfoliated samples, as determined by low-temperature electrical transport and magnetotransport measurements. Small-grain samples exhibit much greater variation in quality and inferior performance by multiple measures, even in samples exhibiting high field-effect mobility. These results confirm the possibility of achieving high-performance graphene devices based on a scalable synthesis process. PMID:22582828

  20. Superior Mobility in Chemical Vapor Deposition Synthesized Graphene by Grain Size Engineering

    NASA Astrophysics Data System (ADS)

    Petrone, Nicholas; Dean, Cory; Meric, Inanc; van der Zande, Arend; Huang, Pinshane; Wang, Lei; Muller, David; Shepard, Kenneth; Hone, James

    2012-02-01

    Chemical vapor deposition (CVD) offers a promising method to produce large-area films of graphene, crucial for commercial realization of graphene-based applications. However, electron transport in CVD grown graphene has continued to fall short of the performance demonstrated by graphene derived from mechanical exfoliation. Lattice defects and grain boundaries developed during growth, structural defects and chemical contamination introduced during transfer, and charged scatterers present in sub-optimal dielectric substrates have all been identified as sources of disorder in CVD grown graphene devices. We grow CVD graphene and fabricate field-effect transistors, attempting to minimize potential sources of disorder. We reduce density of grain boundaries in CVD graphene by controlling domain sizes up to 250 microns. By transferring CVD graphene onto h-BN utilizing a dry-transfer method, we minimize trapped charges at the interface between graphene and in the underlying substrate. We report field-effect mobilities up to 110,000 cm2V-1s-1 and oscillations in magnetotransport measurements below 1 T, confirming the high quality and low disorder in our CVD graphene devices.