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Sample records for coupled cf4 plasmas

  1. Simulation and Experimental Measurements of Inductively Coupled CF4 and CF4/Ar Plasmas

    NASA Technical Reports Server (NTRS)

    Hash, D. B.; Bose, D.; Rao, M. V. V. S.; Cruden, B. A.; Meyyappan, M.; Sharma, S. P.; Arnold, James O. (Technical Monitor)

    2000-01-01

    The recently developed code SEMS (semiconductor equipment modeling software)is applied to the simulation of CF4 and CF4/Ar inductively coupled plasmas (ICP). This work builds upon the earlier nitrogen, transformer coupled plasma (TCP) SEMS research by demonstrating its accuracy for more complex reactive mixtures, moving closer to the realization of a virtual plasma reactor. Attention is given to the etching of and/or formation of carbonaceous films on the quartz dielectric window and diagnostic aperatures. The simulations are validated through comparisons with experimental measurements using FTIR (Fourier Transform Infrared) and UV absorption spectroscopy for CFx and SiFx neutral radicals, QMS (quadrupole mass spectrometry) for the ions, and Langmuir probe measurements of electron number density and temperature in an ICP GEC reference cell.

  2. Mode transition in CF4 + Ar inductively coupled plasma

    NASA Astrophysics Data System (ADS)

    Liu, Wei; Gao, Fei; Zhao, Shu-Xia; Li, Xue-Chun; Wang, You-Nian

    2013-12-01

    The E to H mode transitions are studied by a hairpin probe and optical emission spectroscopy in inductively coupled CF4 + Ar plasmas. Electron density, optical emission intensity of Ar, and the voltage and current are measured during the E to H mode transitions. It is found that the electron density and plasma emission intensity increase continuously at low pressure during the E to H mode transition, while they jump up discontinuously at high pressure. Meanwhile, the transition threshold power and △P (the power interval between E and H mode) increase by increasing the pressure. When the ratio of CF4 increases, the E to H mode transition happens at higher applied power, and meanwhile, the △P also significantly increases. Besides, the effects of CF4 gas ratio on the plasma properties and the circuit electrical properties in both pure E and H modes were also investigated. The electron density and plasma emission intensity both decrease upon increasing the ratio of CF4 at the two modes, due to the stronger electrons loss scheme. The applied voltages at E and H modes both increase as increasing the CF4 gas ratio, however the applied current at two modes behave just oppositely with the gas ratio.

  3. Nanoscale dry etching of germanium by using inductively coupled CF4 plasma

    NASA Astrophysics Data System (ADS)

    Shim, Kyu-Hwan; Yang, Ha Yong; Kil, Yeon-Ho; Yang, Hyeon Deok; Yang, Jong-Han; Hong, Woong-Ki; Kang, Sukill; Jeong, Tae Soo; Kim, Taek Sung

    2012-08-01

    The nanoscale dry etching of germanium was investigated by using inductively coupled CF4 plasma and electron-beam lithography. The optimal dose of PMMA as E-beam lithography resist was ˜200 mC/cm2. When ICP Power was 200W, CF4 gas flow rate was 40 sccm, and process pressure was 20 mTorr, it had a smooth surface and good etch rate. The etching selectivity of Ge wafer to PMMA resist was as low as ˜1.5. Various sub-100 nm dry-etching patterns have been obtained. SEM pictures showed good profile qualities with a smooth etching sidewall and ultrasmall etching features.

  4. Langmuir Probe Measurements of Inductively Coupled Plasmas in CF4/Ar/O2 Mixtures

    NASA Technical Reports Server (NTRS)

    Rao, M. V. V. S.; Meyyappan, M.; Sharma, S. P.

    2000-01-01

    Fluorocarbon gases, such as CF4, and their mixtures are widely used in contemporary low-pressure and high-density plasma processing techniques. In such plasmas Langmuir probe is one of the most commonly employed diagnostic techniques to obtain electron number density (ne), electron temperature (Te), electron energy distribution function (EEDF), mean electron energy (Ee), ion number density (ni), and plasma potential (Vp). In this paper we report probe data for planar inductively coupled plasmas in CF4/O2/Ar mixtures. By varying the relative concentrations in the mixture, radial profiles of ne, ni, Te, Ee, Vp, EEDF were measured in the mid-plane of the plasma at 10 mTorr and 20 mTorr of gas pressures, and 200 W and 300 W of RF powers. Data show that ne and ni decrease with increase of CF4 content and decrease of gas-pressure but they increase with increase of RF-power, whereas Vp increases with decrease of gas-pressure and remains independent of RF-power. However, they all peak at the center of the plasma and decrease towards the edge while Te follows the other way and increases a little with increase of power. The measured EEDFs exhibit Druyvesteyn-like distribution at all pressures and powers. Data are analyzed and will be presented.

  5. Langmuir Probe Measurements in an Inductively Coupled Ar/CF4 Plasmas

    NASA Technical Reports Server (NTRS)

    Rao, M. V. V. S.; Meyyappan, M.; Sharma, S. P.; Arnold, James O. (Technical Monitor)

    2000-01-01

    Technological advancement in the microelectronics industry requires an understanding of the physical and chemical processes occurring in plasmas of fluorocarbon gases, such as carbon tetrafluoride (CF4) which is commonly used as an etchant, and their mixtures to optimize various operating parameters. In this paper we report data on electron number density (ne), electron temperature'(Te), electron energy distribution function (EEDF), mean electron energy, ion number density (ni), and plasma potential (Vp) measured by using Langmuir probe in an inductively coupled 13.56 MHz radio frequency plasmas generated in 50%Ar:50%CF4 mixture in the GEC cell. The probe data were recorded at various radial positions providing radial profiles of these plasma parameters at 10-50 mTorr pressures and 200 W and 300 W of RF power. Present measurements indicate that the electron and ion number densities increase with increase in pressure and power. Whereas the plasma potential and electron temperature decrease with increase in pressure, and they weakly depend on RF power. The radial profiles exhibit that the electron and ion number densities and the plasma potential peak at the center of the plasma with an exponential fall away from it, while the electron temperature has a minimum at the center and it increases steadily towards the electrode edge. The EEDFs have a characteristic drop near the low energy end at all pressures and pressures and their shapes represent non-Maxwellian plasma and exhibit more like Druyvesteyn energy distribution.v

  6. Langmuir Probe Measurements of Inductively Coupled Plasma in CF4/AR/O2 Mixtures

    NASA Technical Reports Server (NTRS)

    Rao, M. V. V. S.; Cruden, Brett; Sharma, Surendra; Meyyappan, Meyya

    2001-01-01

    Inductively coupled plasmas of CF4:Ar:O2, which have been of importance to material processing, were studied in the GEC cell at 80:10:10, 60:20:20, and 40:30:30 mixture ratios. Radial distributions of plasma potential (V(sub p)), electron and ion number densities (n(sub e) and n(sub i)), electron temperature (T(sub e)), and electron energy distribution functions (EEDFs) were measured in the mid-plane of plasma across the electrodes in the pressure range of 10-50 mTorr, and RF power of 200 and 300 W. V(sub p), n(sub e) and n(sub i), which peak in the center of the plasma, increase with decrease of pressure. T(sub e) also increases with pressure but peaks toward the electrode edge. Both V(sub p) and T(sub e) remain nearly independent of RF power, whereas n(sub e) and n(sub i) increase with power. In all conditions the EEDFs exhibit non-Maxwellian shape and are more like Druyvesteyn form at higher energies. They exhibit a broad lip in the energy range 0-10 eV suggesting an electron loss mechanism, which could be due to via resonance electron attachment processes producing negative ions in this rich electronegative gas mixture. This behavior is more prominent towards the electrode edge.

  7. Langmuir Probe Measurements of Inductively Coupled Plasmas in CF4/Ar/O2 Mixtures

    NASA Technical Reports Server (NTRS)

    Rao, M. V. V. S.; Cruden, Brett; Sharma, Surendra; Meyyappan, Meyya

    2001-01-01

    Inductively coupled plasmas of CF4:Ar:O2, which have been of importance to material processing, were studied in the GEC cell at 80:10:10, 60:20:20, and 40:30:30 mixture ratios. Radial distributions of plasma potential (V(sub p)), electron and ion number densities (n(sub e) and n(sub i), electron temperature (T(sub e)), and electron energy distribution functions (EEDFs) were measured in the mid-plane of plasma across the electrodes in the pressure range of 10-50 mTorr, and RF (radio frequency) power of 200 and 300 W. V(sub p), n(sub e) and n(sub i), which peak in the center of the plasma, increase with decrease of pressure. T(sub e) also increases with pressure but peaks toward the electrode edge. Both V(sub p) and T(sub e) remain nearly independent of RF power, whereas n(sub e) and n(sub i) increase with power. In all conditions the EEDFs exhibit non-Maxwellian shape and are more like Druyvesteyn form at higher energies. They exhibit a broad dip in the energy range 0-10 eV suggesting an electron loss mechanism, which could be due to via resonance electron attachment processes producing negative ions in this rich electronegative gas mixture. This behavior is more prominent towards the electrode edge.

  8. Langmuir Probe and Mass Spectroscopic Measurements in Inductively Coupled CF4 Plasmas

    NASA Technical Reports Server (NTRS)

    Rao, M. V. V. S.; Sharma, Surendra; Cruden, B. A.; Meyyappan, M.

    2001-01-01

    Abstract Electron and ion energy distribution functions and other plasma parameters such as plasma potential (V(sub p)) , electron temperature (T(sub e)), and electron and ion number densities (n (sub e) and n(sub i)) in low pressure CF4 plasmas have been measured. The experiments were conducted in a GEC cell using an inductively coupled plasma (ICP) device powered by a 13.56 MHz radio-frequency (rf) power source. The measurements were made at 300 W of input rf power at 10, 30 and 50 mTorr gas pressures. Langmuir probe measurements suggest that n(sub e), n(sub i) and V(sub p) remain constant over 60% of the central electrode area, beyond which they decrease. Within the limits of experimental error (+/- 0.25 eV), T(sub e) remains nearly constant over the electrode area. T(sub e) and V(sub p) increase with a decrease in pressure. n(sub e) and n(sub i) are not affected as significantly as T(sub e) or V(sub p) by variation in the gas pressure. The electron energy distribution function (EEDF) measurements indicate a highly non-Maxwellian plasma. CF3+ is the most dominant ion product of the plasma, followed by CF2+ and CF+. The concentrations of CF2+ and CF+ are much larger than that is possible from direct electron impact ionization of the parent gas. The cross-section data suggest that the direct electron impact ionization of fragment neutrals and negative ion production by electron attachment may be responsible for increase of the minor ions.

  9. Neutral Gas Temperature Estimates in an Inductively Coupled CF4 Plasma by Fitting Diatomic Emission Spectra

    NASA Technical Reports Server (NTRS)

    Cruden, Brett A.; Rao, M. V. V. S.; Sharma, Surendra P.; Meyyappan, M.

    2001-01-01

    This work examines the accuracy of plasma neutral temperature estimates by fitting the rotational band envelope of different diatomic species in emission. Experiments are performed in an inductively coupled CF4 plasma generated in a Gaseous Electronics Conference reference cell. Visible and ultraviolet emission spectra are collected at a power of 300 W (approximately 0.7 W/cc) and pressure of 30 mtorr. The emission bands of several molecules (CF, CN, C2, CO, and SiF) are fit simultaneously for rotational and vibrational temperatures and compared. Four different rotational temperatures are obtained: 1250 K for CF and CN, 1600 K for CO, 1800 K for C2, and 2300 K for SiF. The vibrational temperatures obtained vary from 1750-5950 K, with the higher vibrational temperatures generally corresponding to the lower rotational temperatures. These results suggest that the different species have achieved different degrees of equilibration between the rotational and vibrational modes and may not be equilibrated with the translational temperatures. The different temperatures are also related to the likelihood that the species are produced by ion bombardment of the surface, with etch products like SiF, CO, and C2 having higher temperatures than species expected to have formed in the gas phase.

  10. Experimental and theoretical study of RF capacitively coupled plasma in Ar-CF4-CF3I mixtures

    NASA Astrophysics Data System (ADS)

    Proshina, O. V.; Rakhimova, T. V.; Lopaev, D. V.; Šamara, V.; Baklanov, M. R.; de Marneffe, J.-F.

    2015-10-01

    Radio frequency capacitively coupled plasma (RF CCP) sustained at RF frequencies of 27 MHz in an Ar-CF4-CF3I gas mixture is studied experimentally and theoretically. The RF CCP in Ar-CF4-CF3I is simulated by using a 1D hybrid particle-in-cell-fluid numerical model. We pay special attention to the changes in plasma structure and fluxes to the electrode, negative ion and neutral radical production with admixture of CF3I in Ar-CF4 plasma. With CF3I admixture the plasma becomes strongly electronegative as a result of the high electron attachment rate to the CF3I molecule. The atomic fluorine density becomes extremely low with addition of CF3I molecules due to the large volume loss in the reaction CF3I + F  →  CF3 + IF. Optical emission spectrometry data on CF2 emission at the wavelength of 250 nm indicate the essential sources of CF2 in CF3I-containing plasma in the studied conditions, although direct dissociation channels for the CF3I molecule with CF2 production have not been studied. Evaluation of CF2 density in Ar-CF4-CF3I plasma was first carried out on the basis of the actinometry technique and numerical simulation. The possible mechanism of ultra-low-k film damage in the studied conditions is also discussed.

  11. Ion Energy and Ion Flux Distributions of CF4/Ar/O2 Inductively Coupled Plasmas in a GEC Cell

    NASA Technical Reports Server (NTRS)

    Rao, M. V. V. S.; Cruden, Brett; Sharma, Surendra; Meyyappan, Meyya

    2001-01-01

    Knowledge of ion kinetics in plasma processing gas mixtures, such as CF4:Ar:O2, is important for understanding plasma assisted etching and deposition of materials. Ion energies and ion fluxes were measured in this mixture for 80:10:10, 60:20:20, and 40:30:30 mixture ratios in the pressure range of 10-50 mTorr, and at 200 and 300 W of RF power. Ions from plasma, sampled through a 10 micron orifice in the center of the lower plane electrode, were energy and mass analyzed by a combination of electrostatic energy and quadrupole mass filters. CFx(+) (x = 1 - 3), F2(+), F(+), C(+) from CF4, Ar(+) from Ar, and O2(+) and O(+) from O2, and by-product ions SiFx(+)(x = 1 - 3) from etching of quartz coupling window, COFx(+)(x = 1 - 3), CO(+), CO2(+), and OF(+) were detected. In all conditions ion flux decreases with increase of pressure but increase with increase of RF power. Ar(+) signal decreases with increase of pressure while CF3(+), which is the dominant ion at all conditions, increases with increase in pressure. The loss mechanism for Ar(+) and increase of CF3(+) is due to large cross section for Ar(+) + CF4 yields Ar + CF3(+) + F. Ion energies, which range from 15-25 eV depending on plasma operating conditions, are nearly Gaussian. By-product ion signals are higher at lower pressures indicating stronger plasma interaction with quartz window.

  12. Etching characteristics and mechanisms of Mo thin films in Cl2/Ar and CF4/Ar inductively coupled plasmas

    NASA Astrophysics Data System (ADS)

    Lim, Nomin; Efremov, Alexander; Yeom, Geun Young; Choi, Bok-Gil; Kwon, Kwang-Ho

    2014-11-01

    The etching characteristics and mechanism of Mo thin films in Cl2/Ar and CF4/Ar inductively coupled plasmas under the same operating conditions (pressure, 6 mTorr; input power, 700 W; bias power, 200 W) were investigated. For both gas mixtures, an increase in the Ar fraction or gas pressure at a fixed gas mixing ratio was found to cause a non-monotonic change in the Mo etching rates. The X-ray photoelectron spectroscopy (XPS) diagnostics indicated contamination of the etched surfaces by reaction products. The Cl2/Ar and CF4/Ar plasma parameters were also investigated using a combination of a zero-dimensional plasma model and plasma diagnostics using Langmuir probes. An analysis of the etching kinetics with the model-predicted fluxes of the plasma active species suggests that: 1) the Mo etching process occurs in the transitional regime of the ion-assisted chemical reaction, and 2) the non-monotonic Mo etching rate is probably associated with opposing changes in the fluxes of the reactive neutral species and ion energy.

  13. Measurements of Ion Energy and Ion Flux Distributions in Inductively Coupled Plasmas in CF4/O2/Ar Mixtures

    NASA Technical Reports Server (NTRS)

    Rao, M. V. V. S.; Kim, J. S.; Cappelli, M. A.; Sharma, Surendra; Partridge, Harry (Technical Monitor)

    1999-01-01

    We report mass spectrometric studies of energy distributions and absolute concentrations of ions generated in CF4/O2/Ar inductively coupled rf plasmas. The ions were collected through a 100 mm orifice in the grounded and water cooled lower electrode in a GEC cell configuration. The measurements were made at gas pressures in the 10-50 mTorr range and rf coil power in the 100-300 W range. The observed ions are CF3(+), CF2(+), CF(+), C(+), F(+), COF(+), CO(+), O2(+), and O(+). The relative abundance of these ions varies with pressure and rf power. The energy distribution and absolute concentrations are correlated with electron number density and floating plasma potential measured by a compensated Langmuir probe.

  14. High density plasma etching of ultrananocrystalline diamond films in O2/CF4 and O2/SF6 inductively coupled plasmas

    NASA Astrophysics Data System (ADS)

    Park, Jong Cheon; Kim, Seong Hak; Kim, Tae Gyu; Kim, Jin Kon; Cho, Hyun; Lee, Byeong Woo

    2015-03-01

    Inductively coupled plasma etching of ultrananocrystalline diamond (UNCD) films was performed in O2/CF4 and O2/SF6 discharges. Higher etch rates were produced for the O2/SF6 discharges and the films etched in the 10O2/5CF4 discharges retained smooth surface morphology similar to the unetched control sample. Al mask showed a good etch selectivity to the UNCD for both plasma chemistries and highly anisotropic pattern transfer with a vertical sidewall profile was achieved.

  15. Application of Si and SiO2 Etching Mechanisms in CF4/C4F8/Ar Inductively Coupled Plasmas for Nanoscale Patterns.

    PubMed

    Lee, Junmyung; Efremov, Alexander; Yeom, Geun Young; Lim, Nomin; Kwon, Kwang-Ho

    2015-10-01

    An investigation of the etching characteristics and mechanism for both Si and SiO2 in CF4/C4F8/Ar inductively coupled plasmas under a constant gas pressure (4 mTorr), total gas flow rate (40 sccm), input power (800 W), and bias power (150 W) was performed. It was found that the variations in the CF4/C4F8 mixing ratio in the range of 0-50% at a constant Ar fraction of 50% resulted in slightly non-monotonic Si and SiO2 etching rates in CF4-rich plasmas and greatly decreasing etching rates in C4F8-rich plasmas. The zero-dimensional plasma model, Langmuir probe diagnostics, and optical emission spectroscopy provided information regarding the formation-decay kinetics for the plasma active species, along with their densities and fluxes. The model-based analysis of the etching kinetics indicated that the non-monotonic etching rates were caused not by the similar behavior of the fluorine atom density but rather by the opposite changes of the fluorine atom flux and ion energy flux. It was also determined that the great decrease in both the Si and SiO2 etching rates during the transition from the CF4/Ar to C4F8/Ar gas system was due to the deposition of the fluorocarbon polymer film. PMID:26726514

  16. Optimization of time on CF4/O2 etchant for inductive couple plasma reactive ion etching of TiO2 thin film

    NASA Astrophysics Data System (ADS)

    Adzhri, R.; Arshad, M. K. Md.; Fathil, M. F. M.; Hashim, U.; Ruslinda, A. R.; Ayub, R. M.; Gopinath, Subash C. B.; Voon, C. H.; Foo, K. L.; M. Nuzaihan M., N.; Azman, A. H.; Zaki, M.

    2016-07-01

    In this work, we investigate the optimum etching of titanium dioxide (TiO2) using inductive couple plasma reactive ion etching (ICP-RIE) on our fabricated devices. By using a combination of CF4/O2 gases as plasma etchant with ratio of 3:1, three samples of TiO2 thin film were etched with different time duration of 10 s, 15 s and 20 s. The ion bombardment of CF4 gases with plasma enhancement by O2 gas able to break the oxide bond of TiO2 and allow anisotropic etch profile with maximum etch rate of 18.6 nm/s. The sample was characterized by using optical profilometer to determine the depth of etched area and scanning electron microscopy (SEM) for etch profile characterization.

  17. Etching of new phase change material Ti0.5Sb2Te3 by Cl2/Ar and CF4/Ar inductively coupled plasmas

    NASA Astrophysics Data System (ADS)

    Zhang, Zhonghua; Song, Sannian; Song, Zhitang; Cheng, Yan; Zhu, Min; Li, Xiaoyun; Zhu, Yueqin; Guo, Xiaohui; Yin, Weijun; Wu, Liangcai; Liu, Bo; Feng, Songlin; Zhou, Dong

    2014-08-01

    The etching characteristics of new phase change material Ti0.5Sb2Te3 (TST) were studied with the Cl2/Ar or CF4/Ar gas mixture using inductively coupled plasmas system. The effects of gas-mixing ratio, bias power, gas pressure, applying ICP power on the variations of etch rate, etch profiles, and surface roughness were investigated, respectively. Furthermore, X-ray photoelectron spectroscopy (XPS) compositional depth profiling was used to determine the surface degradation of etched TST using Cl2/Ar and CF4/Ar gas mixture. The etched TST shows a shift of the peaks related to Sb and Te to a higher energy for both etching gas, indicating the surface degradation of TST after etching. TST etched by Cl2 shows a thicker chloride layer remaining on the etched surface than fluorinate layer etched by CF4 owing to the higher reactivity. In the case of CF4, a thinner C-F polymer layer was observed on the etched surface, indicating lower etch rate due to the difficulty in making F diffusion into the TST through the C-F layer.

  18. Control of electron energy distributions and plasma characteristics of dual frequency, pulsed capacitively coupled plasmas sustained in Ar and Ar/CF4/O2

    NASA Astrophysics Data System (ADS)

    Song, Sang-Heon; Kushner, Mark J.

    2012-10-01

    The fluxes of radicals and ions to the wafer during plasma processing of microelectronics devices determine the quality of the etch or deposition. These fluxes are largely controlled by controlling the electron energy distribution function f(ɛ) which determines the dissociation patterns of feedstock gases. In quasi-steady state operation, an equilibrium condition for f(ɛ) results from a real time balance between electron sources and sinks. Using pulsed power, electron sources and sinks do not need to instantaneously balance—they only need to balance over the longer pulse period. This provides additional leverage to customize f(ɛ). In this paper, the f(ɛ) in a two-frequency, pulsed capacitively coupled plasma sustained in Ar and Ar/CF4/O2 mixtures are discussed with results from a two-dimensional plasma hydrodynamics model. The f(ɛ) are obtained from a Monte Carlo simulation which includes electron-electron collisions. We found that the f(ɛ) and rate coefficients can be controlled by pulse repetition frequency (PRF) and duty cycle (DC) of the pulsed power in a manner not otherwise easily attainable using continuous excitation. The tail of the f(ɛ) is enhanced with smaller PRF and DC in order to compensate for the electron losses during the power-off portion of the cycle.

  19. Two modes of capacitively coupled rf discharge in CF4

    NASA Astrophysics Data System (ADS)

    Proshina, O. V.; Rakhimova, T. V.; Rakhimov, A. T.; Voloshin, D. G.

    2010-12-01

    Capacitively coupled rf discharge in pure CF4 was studied using a one-dimensional self-consistent particle-in-cell Monte Carlo model. Two different discharge modes are observed depending on the discharge conditions: the regime of electronegative plasma with high-electron temperatures in the bulk, and the regime of electropositive plasma with abnormally low electron temperatures in the bulk. The characteristic features of the two discharge modes are considered. A sharp transition from the former to the latter mode is observed with an increase in applied voltage. The dependence of the transition voltage on gas pressure is analyzed. In the studied range of gas pressures, the existence of a high-temperature mode in an electronegative gas like CF4 is suggested by the balance between the ionization rate and attachment rate in the bulk region. As a result, the transition voltage increases with gas pressure because of the increased relative role of electron attachment. It is shown that the differences in the used electron cross-section sets may noticeably affect the simulation results and the discharge properties. Three different electron cross-section sets for CF4 are considered. In particular, the transition voltage between the two discharge modes differs essentially for different cross-sections used. In order to analyze the fundamental causes of this difference, a detailed comparison of three cross-section sets was done on the basis of the Monte Carlo calculation of swarm parameters in constant electric fields.

  20. Controlled MoS2 layer etching using CF4 plasma

    NASA Astrophysics Data System (ADS)

    Jeon, Min Hwan; Ahn, Chisung; Kim, HyeongU; Kim, Kyong Nam; Zhe LiN, Tai; Qin, Hongyi; Kim, Yeongseok; Lee, Sehan; Kim, Taesung; Yeom, Geun Young

    2015-09-01

    A few-layered molybdenum disulfide (MoS2) thin film grown by plasma enhanced chemical vapor deposition was etched using a CF4 inductively coupled plasma, and the possibility of controlling the MoS2 layer thickness to a monolayer of MoS2 over a large area substrate was investigated. In addition, damage and contamination of the remaining MoS2 layer surface after etching and a possible method for film recovery was also investigated. The results from Raman spectroscopy and atomic force microscopy showed that one monolayer of MoS2 was etched by exposure to a CF4 plasma for 20 s after an initial incubation time of 20 s, i.e., the number of MoS2 layers could be controlled by exposure to the CF4 plasma for a certain processing time. However, XPS data showed that exposure to CF4 plasma induced a certain amount of damage and contamination by fluorine of the remaining MoS2 surface. After exposure to a H2S plasma for more than 10 min, the damage and fluorine contamination of the etched MoS2 surface could be effectively removed.

  1. Effects of gas flow rate on the etch characteristics of a low- k sicoh film with an amorphous carbon mask in dual-frequency CF4/C4F8/Ar capacitively-coupled plasmas

    NASA Astrophysics Data System (ADS)

    Kwon, Bong-Soo; Lee, Hea-Lim; Lee, Nae-Eung; Kim, Chang-Young; Choi, Chi Kyu

    2013-01-01

    Highly selective nanoscale etching of a low-dielectric constant (low- k) organosilicate (SiCOH) layer using a mask pattern of chemical-vapor-deposited (CVD) amorphous carbon layer (ACL) was carried out in CF4/C4F8/Ar dual-frequency superimposed capacitively-coupled plasmas. The etching characteristics of the SiCOH layers, such as the etch rate, etch selectivity, critical dimension (CD), and line edge roughness (LER) during the plasma etching, were investigated by varying the C4F8 flow rate. The C4F8 gas flow rate primarily was found to control the degree of polymerization and to cause variations in the selectivity, CD and LER of the patterned SiCOH layer. Process windows for ultra-high etch selectivity of the SiCOH layer to the CVD ACL are formed due to the disproportionate degrees of polymerization on the SiCOH and the ACL surfaces.

  2. Study on Surface Modification of Indium Tin Oxide and Resist Surfaces Using CF4/O2 Plasma for Manufacturing Organic Light-Emitting Diodes by Inkjet Printing

    NASA Astrophysics Data System (ADS)

    Ikagawa, Masakuni; Tohno, Ichiro; Shinmura, Tadashi; Takagi, Shigeyuki; Kataoka, Yoshinori; Fujihira, Masamichi

    2008-12-01

    We studied a surface modification technique for indium tin oxide (ITO) anodes without precleaning and resist banks for manufacturing organic light-emitting diodes (OLEDs) by inkjet printing. The ITO surface modified by inductively coupled plasma (ICP) with an optimized CF4/O2 (7:3) gas mixture improved both its hydrophilicity and its work function, while the resist surface treated by the plasma became hydrophobic. The resist and ITO surfaces treated by plasmas of various gas mixtures (i.e., CF4, CF4/Ar (1:2), CF4/O2 (x:1; x=1, 7/3, 4, and 9) were analyzed by X-ray photoelectron spectroscopy (XPS) of the C 1s, F 1s, O 1s, and In 3d5/2 core levels. On the uncleaned ITO surfaces modified by CF4/O2 plasmas, organic contaminants were removed more efficiently and the deposition of CFx on the remaining contaminants decreased with increasing oxygen. The amount of F in the form of InFx increased using the CF4/O2 (7:3) plasma in comparison with that using the CF4/Ar and CF4 plasmas. We investigated the effect of adding oxygen to CF4 on the change in gaseous species produced in the plasma chamber by mass spectrometry. In the CF4/O2 (7:3) plasma, the peak intensities of F+, HF+, F2+, O+, and O2+ were higher than those in the CF4 plasma. The results suggest that In2O3 was generated by the oxidation of indium with O, and InFx was generated by the fluoridation of indium with HF. By introducing InFx onto ITO surfaces using the CF4/O2 plasma, the hole-injection energy barrier could be reduced.

  3. Li^+ attachment mass spectrometric investigation of high-mass neutral species in the downstream region of Ar/CF4, Ar/CF4/O2 and Ar/CF4/H2 plasmas

    NASA Astrophysics Data System (ADS)

    Furuya, Kenji; Okumura, Hiroshi; Tamai, Yuji; Ide, Akihiro; Harata, Akira

    2008-10-01

    Recently gaseous high-mass species have received significant attentions as important contributors to the nucleation of films and particulates in fluorocarbon plasmas. We have unambiguously identified the gaseous high-mass neutral species in the downstream region of the Ar/CF4 plasma [1], using the Li^+ attachment ionization technique that is a fragment-free ionization method. In this report, we show the results of mass analysis of high-mass neutral species in the Ar/CF4/O2 and Ar/CF4/H2 plasmas as well as Ar/CF4. In the Ar/CF4 plasma, we observed CnF2n+2 (n = 2-7) and CnF2n (n = 4-8) as neutral species. Adding O2 to the Ar/CF4 plasma resulted in the intensity decrease of CnF2n+2 and CnF2n, especially of those with relatively small n values. CnF2nO (n = 1-7) were newly observed in the Ar/CF4/O2 plasma. In contrast, adding H2 to the Ar/CF4 plasma resulted in the production of various new compounds, such as CnF2n-2 (n=3-8), CnF2n-4 (n=3-9), CnF2n+1H (n=1-7), CnF2n-1H (n=2-8), CnF2n-3H (n=4-9) and CnF2n-5H (n=5-9). These species are produced through the abstraction of F from various CnFm species by the H radical and the addition of H to them. [1] K. Furuya, S. Yukita, H. Okumura, A. Harata, Chem. Lett. 34, 224 (2005).

  4. Super-hydrophobicity and oleophobicity of silicone rubber modified by CF 4 radio frequency plasma

    NASA Astrophysics Data System (ADS)

    Gao, Song-Hua; Gao, Li-Hua; Zhou, Ke-Sheng

    2011-03-01

    Owing to excellent electric properties, silicone rubber (SIR) has been widely employed in outdoor insulator. For further improving its hydrophobicity and service life, the SIR samples are treated by CF 4 radio frequency (RF) capacitively coupled plasma. The hydrophobic and oleophobic properties are characterized by static contact angle method. The surface morphology of modified SIR is observed by atom force microscope (AFM). X-ray photoelectron spectroscopy (XPS) is used to test the variation of the functional groups on the SIR surface due to the treatment by CF 4 plasma. The results indicate that the static contact angle of SIR surface is improved from 100.7° to 150.2° via the CF 4 plasma modification, and the super-hydrophobic surface of modified SIR, which the corresponding static contact angle is 150.2°, appears at RF power of 200 W for a 5 min treatment time. It is found that the super-hydrophobic surface ascribes to the coaction of the increase of roughness created by the ablation action and the formation of [-SiF x(CH 3) 2- x-O-] n ( x = 1, 2) structure produced by F atoms replacement methyl groups reaction, more importantly, the formation of [-SiF 2-O-] n structure is the major factor for super-hydrophobic surface, and it is different from the previous studies, which proposed the fluorocarbon species such as C-F, C-F 2, C-F 3, CF-CF n, and C-CF n, were largely introduced to the polymer surface and responsible for the formation of low surface energy.

  5. Electron Cyclotron Resonance Based Chemically Assisted Plasma Etching Of Silicon in CF4/Ar Plasma

    NASA Astrophysics Data System (ADS)

    Bhardwaj, R. K.; Angra, S. K.; Bajpai, R. P.; Lal, Madan; Bharadwaj, Lalit M.

    2005-09-01

    Etching of silicon in Chemical Assisted Plasma Etching mode with CF4 gas being sprayed on the surface of wafer in process chamber and Ar fed to ECR cavity in Electron Cyclotron Resonance (ECR) source was carried out. The plasma source was 2.45 GHz microwave source superimposed with mirror type magnetic field configuration to have resonance. Effect of CF4/Ar ratio and substrate bias on etching rate of silicon and anisotropy of etched profile has been investigated. The variation of etch rate and anisotropy has been correlated to the availability of fluorine atoms and other radicals available for etching. Optimum parameters required for etching of silicon in chemical assisted plasma etching with self-assembled ECR plasma source has been established.

  6. Electron Cyclotron Resonance Based Chemically Assisted Plasma Etching Of Silicon in CF4/Ar Plasma

    SciTech Connect

    Bhardwaj, R.K.; Angra, S.K.; Bajpai, R.P.; Lal, Madan; Bharadwaj, Lalit M.

    2005-09-09

    Etching of silicon in Chemical Assisted Plasma Etching mode with CF4 gas being sprayed on the surface of wafer in process chamber and Ar fed to ECR cavity in Electron Cyclotron Resonance (ECR) source was carried out. The plasma source was 2.45 GHz microwave source superimposed with mirror type magnetic field configuration to have resonance. Effect of CF4/Ar ratio and substrate bias on etching rate of silicon and anisotropy of etched profile has been investigated. The variation of etch rate and anisotropy has been correlated to the availability of fluorine atoms and other radicals available for etching. Optimum parameters required for etching of silicon in chemical assisted plasma etching with self-assembled ECR plasma source has been established.

  7. Vacuum ultra-violet emission of CF4 and CF3I containing plasmas and Their effect on low-k materials

    NASA Astrophysics Data System (ADS)

    el Otell, Z.; Šamara, V.; Zotovich, A.; Hansen, T.; de Marneffe, J.-F.; Baklanov, M. R.

    2015-10-01

    CF3I was suggested as a replacement of CF4 gas to decrease the plasma-induced damage (PID) on low-k dielectrics during etching. This proposal is investigated by means of plasma emission measurements and material characterisation. The experiments were conducted in a 300 mm capacitively coupled plasma source. The vacuum ultraviolet (VUV, 30≤slant λ ≤slant 220 nm) plasma emission was measured for discharges generated in a pure or a mixture of argon, CF4 and/or CF3I, since VUV plays a major role in PID. However, CF3I containing discharges were found to have a stronger emission than CF4 in the VUV range. Nevertheless, Fourier transform infra-red spectroscopy and κ-value measurements showed that there is almost no difference between the damage caused by CF3I or CF4 containing plasmas, while etching in a capacitively coupled plasma source. It is proposed that the damage caused by CF3I with lower F*-density but higher VUV-photon flux is similar to the damage caused by CF4, with higher F*-density but lower VUV-photon flux.

  8. Comparison of CF4, CHF3 and CH2F2 plasmas used for wafer processing

    NASA Astrophysics Data System (ADS)

    Tinck, Stefan; Milenin, Alexey; Bogaerts, Annemie

    2012-10-01

    Fluorocarbon-based plasmas are widely used in the microelectronics industry for the fabrication of computer chips, i.e. in plasma etching of silicon. One such process is the etching of nanoscale trenches in the Si substrate with CHxFy plasmas as applied in shallow trench isolation (STI). By carefully altering the ratio between gases such as CF4, CHF3 and CH2F2, the overall etching process can be controlled in terms of chemical etching, sputtering and sidewall passivation. Therefore, we wish to obtain a more fundamental understanding of these plasmas and their surface processes. The plasma behavior will be simulated by a hybrid model for addressing the various plasma species, while the surface interactions of the plasma will be described by additional Monte Carlo simulations, allowing a detailed insight in the nanoscale trench etching process. Bulk plasma properties such as species densities, temperatures and fluxes towards the walls will be discussed under typical wafer processing conditions as well as surface properties including etch rate and chemical composition of the surface during trench etching. The etch rate and microscopic etch profiles will be compared with experimental data.

  9. Surface modification of a polyamide 6 film by He/CF 4 plasma using atmospheric pressure plasma jet

    NASA Astrophysics Data System (ADS)

    Gao, Zhiqiang; Sun, Jie; Peng, Shujing; Yao, Lan; Qiu, Yiping

    2009-12-01

    Polyamide 6 (PA 6) films are treated with helium(He)/CF 4 plasma at atmospheric pressure. The samples are treated at different treatment times. The surface modification of the PA 6 films is evaluated by water contact angle, atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The etching rate is used to study the etching effect of He/CF 4 plasma on the PA 6 films. The T-peel strengths of the control and plasma treated films are measured to show the surface adhesion properties of the films. As the treatment time increases, the etching rate decreases steadily, the contact angle decreases initially and then increases, while the T-peel strength increases first and then decreases. AFM analyses show that the surface roughness increases after the plasma treatment. XPS analyses reveal substantial incorporation of fluorine and/or oxygen atoms to the polymer chains on the film surfaces.

  10. Optimization of a RF-generated CF4/O2 gas plasma sterilization process.

    PubMed

    Lassen, Klaus S; Nordby, Bolette; Grün, Reinar

    2003-05-15

    A sterilization process with the use of RF-generated (13.56 MHz) CF(4)/O(2) gas plasma was optimized in regards to power, flow rate, exposure time, and RF-system type. The dependency of the sporicidal effect on the spore inoculum positioning in the chamber of the RF systems was also investigated. Dried Bacillus stearothermophilus ATCC 7953 endospores were used as test organisms. The treatments were evaluated on the basis of survival curves and corresponding D values. The only parameter found to affect the sterilization process was the power of the RF system. Higher power resulted in higher kill. Finally, when the samples were placed more than 3-8 cm away from a centrally placed electrode in System 2, the sporicidal effect was reduced. The results are discussed and compared to results from the present literature. The RF excitation source is evaluated to be more appropriate for sterilization processes than the MW source. PMID:12687716

  11. Numerical simulation of evolution features of the atmospheric-pressure CF4 plasma generated by the pulsed dielectric barrier discharge

    NASA Astrophysics Data System (ADS)

    Pan, Jie; Li, Li; Chen, Bo; Song, Yuzhi; Zhao, Yuefeng; Xiu, Xianwu

    2016-06-01

    The atmospheric-pressure CF4 plasma has the high application potential in the field of semiconductor fabrication since it can combine the excellent capability for the CF4 plasma etching with the easy atmospheric-pressure operation. In this work, the fluid model has been carried out to numerically research evolution features of the atmospheric-pressure CF4 plasma generated by the pulsed dielectric barrier discharge. The computational results show that the averaged electron temperature dramatically increases during the rising and the falling phases of the applied voltage pulse, and then swiftly decreases. The discharge current density has the waveform of two bipolar short pulses. The electrons and CF3 + ions form the cathode sheath at the discharge duration. However, the CF3 - and F- negative ions take the place of the electrons to sustain the cathode sheath of the CF4 discharge plasma at the time interval between the two bipolar discharge pulses. During the time interval of the two adjacent applied voltage pulses the discharge region is the quasi-neutral plasma region, and meanwhile CF2 + and CF3 - are the dominated charged species. Moreover, F and CF3 maintain the relatively stable high densities and uniform axial distributions during the whole period of the applied voltage.

  12. Heterogeneous processes in CF4/O2 plasmas probed using laser-induced fluorescence of CF2

    NASA Astrophysics Data System (ADS)

    Hansen, S. G.; Luckman, G.; Nieman, George C.; Colson, Steven D.

    1990-09-01

    Laser-induced fluorescence of CF2 is used to monitor heterogeneous processes in ≊300 mTorr CF4/O2 plasmas. CF2 is rapidly removed at fluorinated copper and silver surfaces in 13.56-MHz rf discharges as judged by a distinct dip in its spatial distribution. These metals, when employed as etch masks, are known to accelerate plasma etching of silicon, and the present results suggest catalytic dehalogenation of CF2 is involved in this process. In contrast, aluminum and silicon dioxide exhibit negligible reactivity with CF2, which suggests that aluminum masks will not appreciably accelerate silicon etching and that ground state CF2 does not efficiently etch silicon dioxide. Measurement of CF2 decay in a pulsed discharge coupled with direct laser sputtering of metal into the gas phase indicates the interaction between CF2 and the active metals is purely heterogeneous. Aluminum does, however, exhibit homogeneous reactivity with CF2. Redistribution of active metal by plasma sputtering readily occurs; silicon etch rates may also be enhanced by the metal's presence on the silicon surface. Polymers contribute CF2 to the plasma as they etch. The observation of an induction period suggests fluorination of the polymer surface is the first step in its degradation. Polymeric etch masks can therefore depress the silicon etch rate by removal of F atoms, the primary etchants.

  13. Hydrophobization of polymer particles by tetrafluoromethane (CF4) plasma irradiation using a barrel-plasma-treatment system

    NASA Astrophysics Data System (ADS)

    Matsubara, Keisuke; Danno, Masato; Inoue, Mitsuhiro; Nishizawa, Hideki; Honda, Yuji; Abe, Takayuki

    2013-11-01

    In this study, tetrafluoromethane (CF4) plasma-treatments of polymethylmethacrylate (PMMA) powder were performed using a polygonal barrel-plasma-treatment system to improve the PMMA's hydrophobicity. Characterization of the treated samples showed that the PMMA particle surfaces were fluorinated by the CF4 treatment. The smooth surfaces of the particles changed into nano-sized worm-like structures after the plasma-treatment. The hydrophobicity of the treated PMMA samples was superior to that of the untreated samples. It was noted that the hydrophobicity of the treated samples and the surface fluorination level depended on the plasma-treatment time and radiofrequency (RF) power; high RF power increased the sample temperature, which in turn decreased the hydrophobicity of the treated samples and the surface fluorination because of the thermal decomposition of PMMA. The water-repellent effects were evaluated by using paper towels to show the application of the plasma-treated PMMA particles, with the result that the paper towel coated with the treated sample was highly water-repellent.

  14. ICP Reactor Modeling: CF4 Discharge

    NASA Technical Reports Server (NTRS)

    Bose, Deepak; Govindan, T. R.; Meyyappan, M.

    1999-01-01

    Inductively coupled plasma (ICP) reactors are widely used now for etching and deposition applications due to their simpler design compared to other high density sources. Plasma reactor modeling has been playing an important role since it can, in principle, reduce the number of trial and error iterations in the design process and provide valuable understanding of mechanisms. Fluorocarbon precursors have been the choice for oxide etching. We have data available on CF4 from our laboratory. These are current voltage characteristics, La.ngmuir probe data, UV-absorption, and mass spectrometry measurements in a GEC-ICP reactor. We have developed a comprehensive model for ICP reactors which couples plasma generation and transport and neutral species dynamics with the gas flow equations. The model has been verified by comparison with experimental results for a nitrogen discharge in an ICP reactor. In the present work, the model has been applied to CF4 discharge and compared to available experimental data.

  15. Abatement of CF4 by atmospheric-pressure microwave plasma torch

    NASA Astrophysics Data System (ADS)

    Hong, Yong C.; Uhm, Han S.

    2003-08-01

    An atmospheric microwave plasma torch is presented for post-pump destruction of perfluorocompound gases (PFCs), which are used widely in the semiconductor industry and are emitted with nitrogen gas for vacuum pump purges. Discharges of the microwave plasma torch are well suited for abatement of PFC contaminants discharged at a typical flow rate. The abatement was carried out using oxygen or air as additive gases. Analytical results are systematically compared to quadrupole mass spectroscopy and Fourier transform infrared (FTIR) data in the laboratory. Destruction and removal efficiency of more than 99% in FTIR data was achieved for carbon tetrafluoride.

  16. Degree of functionalization and stability of fluorine groups fixed to carbon nanotubes and graphite nanoplates by CF4 microwave plasma

    NASA Astrophysics Data System (ADS)

    Abdelkader-Fernández, V. K.; Morales-Lara, F.; Melguizo, M.; García-Gallarín, C.; López-Garzón, R.; Godino-Salido, M. L.; López-Garzón, F. J.; Domingo-García, M.; Pérez-Mendoza, M. J.

    2015-12-01

    The fluorination of graphite nanoplates (GNPs) and multi-wall carbon nanotubes (MWCNTs) by CF4 cold plasma is reported. The aim is to analyze the influence of the textural characteristics in the degree of fluorination and in the thermal stability of the fluorine groups. We have used thermal programmed desorption which clearly discriminates the nature of the desorbing species and their stability. The degree of fluorination of both materials is similar up to 20 min of treatment and then it decreases in GNPs at longer treatments. Nevertheless, the fluorine content in MWCNTs keeps increasing after 45 min. This different evolution of the fluorination degree with the time is related to the surface areas. The fluorine bonding is produced not only in defects and irregularities but also on the external graphene sheets of both materials, and it results in up to eight different chemical environments having different thermal stabilities from 150 °C up to temperatures higher than 900 °C. The fluorination increases the electronic states near the Fermi level of the nanotubes whereas it does not affect the electronic properties of graphite nanoplates. It is shown that no intercalation compounds are formed and that the textural characteristics of the materials remain unchanged after fluorination.

  17. On the etching characteristics and mechanisms of HfO2 thin films in CF4/O2/Ar and CHF3/O2/Ar plasma for nano-devices.

    PubMed

    Lim, Nomin; Efremov, Alexander; Yeom, Geun Young; Kwon, Kwang-Ho

    2014-12-01

    The study of etching characteristics and mechanisms for HfO2 and Si in CF4/O2/Ar and CHF3/O2/Ar inductively-coupled plasmas was carried out. The etching rates of HfO2 thin films as well as the HfO2/Si etching selectivities were measured as functions of Ar content in a feed gas (0-50% Ar) at fixed fluorocarbon gas content (50%), gas pressure (6 mTorr), input power (700 W), bias power (200 W), and total gas flow rate (40 sccm). Plasma parameters as well as the differences in plasma chemistries for CF4- and CHF3-based plasmas were analyzed using Langmuir probe diagnostics and 0-dimensional plasma modeling. It was found that, in both gas systems, the non-monotonic (with a maximum at about 15-20% Ar) HfO2 etching rate does not correlate with monotonic changes of F atom flux and ion energy flux. It was proposed that, under the given set of experimental conditions, the HfO2 etching process is affected by the factors determining the formation and decomposition kinetics of the fluorocarbon polymer layer. These factor are the fluxes of CF(x) (x = 1, 2) radicals, O atoms and H atoms. PMID:25971118

  18. Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry

    NASA Astrophysics Data System (ADS)

    Tinck, Stefan; Bogaerts, Annemie

    2016-05-01

    A modelling study is performed of high-density low-pressure inductively coupled CF4/CHF3/H2/Cl2/O2/HBr plasmas under different gas mixing ratios. A reaction set describing the complete plasma chemistry is presented and discussed. The gas fraction of each component in this mixture is varied to investigate the sensitivity of the plasma properties, like electron density, plasma potential and species densities, towards the gas mixing ratios. This research is of great interest for microelectronics applications because these gases are often combined in two (or more)-component mixtures, and mixing gases or changing the fraction of a gas can sometimes yield unwanted reaction products or unexpected changes in the overall plasma properties due to the increased chemical complexity of the system. Increasing the CF4 fraction produces more F atoms for chemical etching as expected, but also more prominently lowers the density of Cl atoms, resulting in an actual drop in the etch rate under certain conditions. Furthermore, CF4 decreases the free electron density when mixed with Cl2. However, depending on the other gas components, CF4 gas can also sometimes enhance free electron density. This is the case when HBr is added to the mixture. The addition of H2 to the gas mixture will lower the sputtering process, not only due to the lower overall positive ion density at higher H2 fractions, but also because more H+, \\text{H}2+ and \\text{H}3+ are present and they have very low sputter yields. In contrast, a larger Cl2 fraction results in more chemical etching but also in less physical sputtering due to a smaller abundance of positive ions. Increasing the O2 fraction in the plasma will always lower the etch rate due to more oxidation of the wafer surface and due to a lower plasma density. However, it is also observed that the density of F atoms can actually increase with rising O2 gas fraction. This is relevant to note because the exact balance between fluorination and oxidation is

  19. Irradiation of poly(tetrafluoroethylene) surfaces by CF4 plasma to achieve robust superhydrophobic and enhanced oleophilic properties for biological applications.

    PubMed

    Salapare, Hernando S; Suarez, Beverly Anne T; Cosiñero, Hannah Shamina O; Bacaoco, Miguel Y; Ramos, Henry J

    2015-01-01

    Poly(tetrafluoroethylene) (PTFE) was irradiated by CF4 plasma produced in the gas discharge ion source facility to produce stable and robust superhydrophobic surfaces and to enhance the materials' oleophilic property for biological applications. The characterizations employed on the samples are contact angle measurements, analysis of the surface morphology (scanning electron microscopy), surface roughness measurements (atomic force microscopy) and analysis of the surface chemistry (Fourier transform infrared spectroscopy). Superhydrophobic behavior with water contact angles as high as 156° was observed. The wettability of all the treated samples was found to be stable in time as evidenced by the statistically insignificant differences in the hysteresis contact angles. The level of enhanced hydrophobicity depended on the plasma energies (i.e. irradiation times, discharge current, and discharge voltage); higher plasma energies produced surfaces with high hydrophobicity. The plasma treatment also enhanced the oleophilic property of the materials' surface as evidenced by the decrease in the PDMS-oil contact angle from 33° to as low as 10°. The superhydrophobicity of the modified PTFE and the enhancement of its oleophilic property were due to (1) the changes in the roughness of the surface, (2) the formation of nanoparticles or nanostructures on the surface, and (3) the changes in the surface chemistry. PMID:25491987

  20. Comparison of CF4 and SF6 based plasmas for ECR etching of isotopically enriched 10Boron films

    SciTech Connect

    Voss, L F; Reinhardt, C E; Graff, R T; Conway, A M; Nikolic, R J; Deo, N; Cheung, C L

    2009-02-23

    Isotopically enriched {sup 10}boron films have been successfully etched in an ECR etching tool using CF{sub 4} and SF{sub 6} based plasmas. Comparisons between the two are made with regards to etch rate, selectivity to the underlying Si device structure, and morphology of the {sup 10}boron post-etching. The present film etching development is expected to be critical for the fabrication of next generation thermal neutron solid state detectors based on {sup 10}boron.

  1. [The spectra of a laser-produced plasma source with CO2, O2 and CF4 liquid aerosol spray target].

    PubMed

    Ni, Qi-Liang; Chen, Bo

    2008-11-01

    A laser-produced plasma (LPP) source with liquid aerosol spray target and nanosecond laser was developed, based on both soft X-ray radiation metrology and extreme ultraviolet projection lithography (EUVL). The LPP source is composed of a stainless steel solenoid valve whose temperature can be continuously controlled, a Nd : YAG laser with pulse width, working wavelength and pulse energy being 7 ns, 1.064 microm and 1J respectively, and a pulse generator which can synchronously control the valve and the laser. A standard General Valve Corporation series 99 stainless steel solenoid valve with copper gasket seals and a Kel-F poppet are used in order to minimize leakage and poppet deformation during high-pressure cryogenic operation. A close fitting copper cooling jacket surrounds the valve body. The jacket clamps a copper coolant carrying tube 3 mm in diameter, which is fed by an automatically pressurized liquid nitrogen-filled dewar. The valve temperature can be controlled between 77 and 473 K. For sufficiently high backing pressure and low temperature, the valve reservoir gas can undergo a gas-to-liquid phase transition. Upon valve pulsing, the liquid is ejected into a vacuum and breaks up into droplets, which is called liquid aerosol spray target. For the above-mentioned LPP source, firstly, by the use of Cowan program on the basis of non-relativistic quantum mechanics, the authors computed the radiative transition wavelengths and probabilities in soft X-ray region for O4+, O5+, O6+, O7+, F5+, F6+ and F7+ ions which were correspondingly produced from the interaction of the 10(11)-10(12) W x cm(-2) power laser with liquid O2, CO2 and CF4 aerosol spray targets. Secondly, the authors measured the spectra of liquid O2, CO2 and CF4 aerosol spray target LPP sources in the 6-20 nm band for the 8 x 10(11) W x cm(-2) laser irradiance. The measured results were compared with the Cowan calculated results ones, and the radiative transition wavelength and probability for the

  2. Modeling The CF4 Laser

    NASA Astrophysics Data System (ADS)

    Patterson, C. W.; McDowell, R. S.; Krohn, B. J.; Nereson, N. G.

    1981-12-01

    The CO2-pumped CF4 laser is a potentially useful source of line-tunable infrared radiation in the region 605-655 cm 1, and the spectroscopy of CF4 has been carried to the point that the laser frequencies that will result from any given pump line can be calculated to better than 0.01 cm 1. We now report quantitative intensity and line-broadening studies on CF4 and their application to modeling the laser gain. First, absorption measurements on isolated lines in the ν2 + ν4 pump band at a series of pressures yield an effective transition dipole moment for this band of 0.010 Debye. At the same time the transition moment for the (ν2 + ν4) - ν2 laser band has been calculated and agrees well with the results of laser self-absorption measurements. Finally, linewidths determined as a function of pressure yield a pressure-broadening coefficient of ca. 10 MHz/torr, significantly greater than that expected from a hard-sphere gas-kinetic model. From these data the gain of the CF4 laser can be calculated at various pressures and temperatures; the results are in reasonable agreement with measured values.

  3. Modeling the CF4 laser

    NASA Astrophysics Data System (ADS)

    Patterson, C. W.; McDowell, R. S.; Krohn, B. J.; Nereson, N. G.

    Quantitative intensity and line broadening studies on CF4 and their application to modeling the laser gain is presented. First, absorption measurements on isolated lines in the v sub 2 + v sub 4 pump band at a series of pressures yield an effective transition dipole moment for this band of 0.010 Debye. At the same time the transition moment for the v sub 2 + v sub 4 - v sub 2 laser band are calculated and agrees well with the results of laser self-absorption measurements. Finally, linewidths determined as a function of pressure yield a pressure broadening coefficient of ca, 10 MHz/torr, significantly greater than that expected from a hard sphere gas kinetic model. From these data the gain of the CF4 laser are calculated at various pressures and temperatures; the results are in reasonable agreement with measured values.

  4. Dry etching of beta-SiC in CF4 and CF4 + O2 mixtures

    NASA Technical Reports Server (NTRS)

    Palmour, J. W.; Davis, R. F.; Wallett, T. M.; Bhasin, K. B.

    1986-01-01

    Dry etching of cubic (100) beta-SiC single-crystal thin films produced via chemical-vapor deposition (CVD) has been performed in CF4 and CF4 + O2 mixtures, in both the reactive-ion-etching (RIE) and plasma-etching modes. The latter process yielded measurable etch rates, but produced a dark surface layer which appears, from the results of secondary-ion mass spectrometry, to be residual SiC. The RIE samples had no residual layer, but Auger electron spectroscopy did reveal a C-rich surface. The optimal RIE conditions were obtained with 10 sccm of pure CF4 at 40 mtorr and a power density of 0.548 W/sq cm, giving an etch rate of 23.3 nm/min. Neither the increase of temperature between 293 and 573 K, nor the incremental addition of O2 to CF4 to 50 percent, produced any strong effect on the etch rates of SiC during RIE. Pictorial evidence of fine line structures produced by RIE of beta-SiC films are also presented.

  5. Reactive ion etching of Si(x)Sb2Te in CF4/Ar plasma for nonvolatile phase-change memory device.

    PubMed

    Gu, Yifeng; Song, Sannian; Song, Zhitang; Cheng, Yan; Liu, Xuyan; Du, Xiaofeng; Liu, Bo; Feng, Songlin

    2013-02-01

    Si(x)Sb2Te material system is novel for phase-change random access memory applications. Its properties are more outstanding than the widely used material Ge2Sb2Te5. Etching process is one of the critical steps in the device fabrication. The etching characteristics of phase-change material Si(x)Sb2Te were studied with CF4/Ar gas mixture by a reactive ion etching system. The changes of etching rate, etching profile and surface root-mean-square roughness resulted from variation of the gas-mixing ratio were investigated under constant pressure (50 mTorr) and applying power (200 W). Si0.34Sb2Te is with the highest phase-change speed and the lowest power consumption in the PCRAM memory among these compositions, which means it is the most promising candidate for the PCRAM applications. So the most optimized CF4/Ar gas ratio for Si0.34Sb2Te was studied, the value is 25/25. The etching rate is 155 nm/min, and the selectivity of Si0.34Sb2Te to SiO2 is as high as 3.4 times. Furthermore, the smooth surface was achieved with this optimized gas ratio. PMID:23646688

  6. A high level computational study of the CH4/CF4 dimer: how does it compare with the CH4/CH4 and CF4/CF4 dimers?

    NASA Astrophysics Data System (ADS)

    Biller, Matthew J.; Mecozzi, Sandro

    2012-04-01

    The interaction within the methane-methane (CH4/CH4), perfluoromethane-perfluoromethane (CF4/CF4) methane-perfluoromethane dimers (CH4/CF4) was calculated using the Hartree-Fock (HF) method, multiple orders of Møller-Plesset perturbation theory [MP2, MP3, MP4(DQ), MP4(SDQ), MP4(SDTQ)], and coupled cluster theory [CCSD, CCSD(T)], as well as the PW91, B97D, and M06-2X density functional theory (DFT) functionals. The basis sets of Dunning and coworkers (aug-cc-pVxZ, x = D, T, Q), Krishnan and coworkers [6-311++G(d,p), 6-311++G(2d,2p)], and Tsuzuki and coworkers [aug(df, pd)-6-311G(d,p)] were used. Basis set superposition error (BSSE) was corrected via the counterpoise method in all cases. Interaction energies obtained with the MP2 method do not fit with the experimental finding that the methane-perfluoromethane system phase separates at 94.5 K. It was not until the CCSD(T) method was considered that the interaction energy of the methane-perfluoromethane dimer (-0.69 kcal mol-1) was found to be intermediate between the methane (-0.51 kcal mol-1) and perfluoromethane (-0.78 kcal mol-1) dimers. This suggests that a perfluoromethane molecule interacts preferentially with another perfluoromethane (by about 0.09 kcal mol-1) than with a methane molecule. At temperatures much lower than the CH4/CF4 critical solution temperature of 94.5 K, this energy difference becomes significant and leads perfluoromethane molecules to associate with themselves, forming a phase separation. The DFT functionals yielded erratic results for the three dimers. Further development of DFT is needed in order to model dispersion interactions in hydrocarbon/perfluorocarbon systems.

  7. A CF4 based positron trap

    NASA Astrophysics Data System (ADS)

    Marjanovic, Srdjan; Bankovic, Ana; Dujko, Sasa; Deller, Adam; Cooper, Ben; Cassidy, David; Petrovic, Zoran

    2016-05-01

    All positron buffer gas traps in use rely on N2 as the primary trapping gas due to its conveniently placed a1 Π electronic excitation cross section that is large enough to compete with positronium (Ps) formation in the threshold region. Its energy loss of 8.5 eV is sufficient to capture positrons into a potential well upon a single collision. The competing Ps formation, however, limits the efficiency of the two stage trap to 25 %. As positron moderators produce beams with energies of several eV we have proposed to use CF4 in the first stage of the trap, due to its large vibrational excitation cross section, where several vibrational excitations would be sufficient to trap the positrons with small losses. Apart from the simulations we also report the results of attempts to apply this approach to an existing Surko-type positron trap. Operating the unmodified trap as a CF4 based device proved to be unsuccessful, due primarily to excessive scattering due to high CF4 pressure in the first stage. However, the performance was consistent with subsequent simulations using the real system parameters. This agreement indicates that an efficient CF4 based scheme may be realized in an appropriately designed trap. also at Serbian Academy of Sciences and Arts, Knez Mihajlova 35, 11000 Belgrade, Serbia.

  8. Spectroscopy Of The CF4 Laser

    NASA Astrophysics Data System (ADS)

    McDowell, R. S.; Patterson, C. W.; Jones, C. R.; Buchwald, M. I.; Telle, J. M.

    1980-11-01

    When v2+v4 of CF4 at 1066 cm-1 is pumped by the 9.4-µm CO2 laser, stimulated emission on the (v2+v4) + v2 transition produces many discrete laser lines in the region 605 to 655 cm-1. A comprehensive program of Doppler-limited absorption spectroscopy of CF4 has been carried out using tunable semiconductor diode lasers, and has led to a full understanding of the rovibrational energy levels involved in the laser process. The frequencies of 28 laser lines of 12CF4 have been measured with an accuracy of ±0.2 cm- 1, for 12C16O2 pump lines from P(14) to R(24). From the complete vibration-rotation analysis of the v2+v4 band, the pump and laser transitions have been identified. Using the spectroscopic constants determined in the band analyses, we can predict within ±0.2 cm-1 the laser lines to be expected from any given pumping frequency. All observed laser lines have been accounted for; in a few cases there is evidence for a relaxation of J-value and/or Coriolis sublevel in the upper state. Application of these results to improving the performance of the CF4 laser and for designing it to produce specific desired output frequencies is discussed.

  9. Impact of Gas Heating in Inductively Coupled Plasmas

    NASA Technical Reports Server (NTRS)

    Hash, D. B.; Bose, D.; Rao, M. V. V. S.; Cruden, B. A.; Meyyappan, M.; Sharma, S. P.; Biegel, Bryan (Technical Monitor)

    2001-01-01

    Recently it has been recognized that the neutral gas in inductively coupled plasma reactors heats up significantly during processing. The resulting gas density variations across the reactor affect reaction rates, radical densities, plasma characteristics, and uniformity within the reactor. A self-consistent model that couples the plasma generation and transport to the gas flow and heating has been developed and used to study CF4 discharges. A Langmuir probe has been used to measure radial profiles of electron density and temperature. The model predictions agree well with the experimental results. As a result of these comparisons along with the poorer performance of the model without the gas-plasma coupling, the importance of gas heating in plasma processing has been verified.

  10. Fourier Transform Infrared Spectroscopy of CF4 on the GEC Reference Cell

    NASA Technical Reports Server (NTRS)

    Rao, M. V. V. S.; Sharma, S. P.; Meyyappan, M.; Cruden, Brett A.; Arnold, Jim (Technical Monitor)

    2001-01-01

    Fourier Transform Infrared Spectroscopy (FTIR) has been used to characterize inductively coupled CF4 plasmas in a GEC Reference Cell in-situ In examining these FTIR spectra, several assumptions and approximations of FTIR analysis are addressed. This includes the density dependence of cross-sections, non-linear effects in the addition of overlapping bands and the effect of spatial variations in density and temperature, This analysis demonstrates that temperatures extracted from MR spectra may provide a poor estimate of the true neutral plasma temperature. The FTIR spectra are dominated by unreacted CF, accounting for 40-60% of the gas products. The amount of CF4 consumption is found to have a marked dependence on power, and is nearly independent of pressure in the range of 10-50 mtorr. Small amounts of C2F6 are observed at low power. Also observed are etching products from the quartz window SiF4 COF2 and CO which occur in approximately equal ratios and together account for less than 10% of the gas. The concentrations of these species are nearly independent of pressure. CFx radicals are below the detection limit of this apparatus (approx. 1012/cc).

  11. Photoionisation study of Xe.CF4 and Kr.CF4 van-der-Waals molecules

    NASA Astrophysics Data System (ADS)

    Alekseev, V. A.; Garcia, G. A.; Kevorkyants, R.; Nahon, L.

    2016-05-01

    We report on photoionization studies of Xe.CF4 and Kr.CF4 van-der-Waals complexes produced in a supersonic expansion and detected using synchrotron radiation and photoelectron-photoion coincidence techniques. The ionization potential of CF4 is larger than those of the Xe and Kr atoms and the ground state of the Rg.CF4+ ion correlates with Rg+ (2P3/2) + CF4. The onset of the Rg.CF4+ signals was found to be only ˜0.2 eV below the Rg ionization potential. In agreement with experiment, complementary ab initio calculations show that vertical transitions originating from the potential minimum of the ground state of Rg.CF4 terminate at a part of the potential energy surfaces of Rg.CF4+, which are approximately 0.05 eV below the Rg+ (2P3/2) + CF4 dissociation limit. In contrast to the neutral complexes, which are most stable in the face geometry, for the Rg.CF4+ ions, the calculations show that the minimum of the potential energy surface is in the vertex geometry. Experiments which have been performed only with Xe.CF4 revealed no Xe.CF4+ signal above the first ionization threshold of Xe, suggesting that the Rg.CF4+ ions are not stable above the first dissociation limit.

  12. Solution and displacement in monolayer and multilayer binary films of SF6 and CF4 on graphite.

    PubMed

    Thomas, Petros; Grogan, Michael D W; Hess, George B

    2015-09-21

    Infrared reflection absorption spectroscopy is used to study the evolution of binary physisorbed films on graphite. A predeposited monolayer of SF6 is exposed to slowly increasing pressure of CF4 at constant temperature between 80 and 113 K. Shifts in the frequencies of the dominant vibrational mode of each species due to resonant dipole-dipole coupling serve as proxies for the areal density of each species in the monolayer. If the initial SF6 film is far below saturation (coexistence with bulk solid), the SF6 can be largely displaced by continuous solution of CF4. However, if the initial SF6 layer is at or near saturation, a layer of CF4 condenses on top at a well defined CF4 pressure after only 2%-3% dilution of the SF6 layer. Simultaneously, most of the dissolved CF4 is withdrawn from the SF6 layer. With further increase in CF4 pressure, the CF4 layer is compressed and additional layers condense, while the SF6 layer is again diluted. Still, the SF6 layer retains about 90% concentration until the CF4 pressure is very close to saturation, at which point the SF6 is rapidly displaced, apparently going into dilute solution in the rapidly growing CF4 multilayer. Monte Carlo simulations are used to quantitatively relate measured frequency shifts to concentrations in the binary monolayer. PMID:26395723

  13. CF4 Adsorption on Open Carbon Nanohorns

    NASA Astrophysics Data System (ADS)

    Khanal, Pravin; Russell, Brice; Migone, Aldo; Iijima, Sumio; Yudasaka, Masako

    We have measured adsorption isotherms at ten different temperatures between 90.4 K and 163.8 K for CF4 on a sample of chemically-opened carbon nanohorns. The interior of the individual nanohorns is accessible to sorbates in these chemically-opened nanohorns. Two substeps are visible in the adsorption data, one corresponding to groups of stronger binding sites (lower pressure substep) and another corresponding to weaker binding sites (higher pressure substep). The stronger binding sites are interstitial pore-like spaces within the nanohorn aggregates and intra-nanohorns pores while the weaker binding sites are the outer surfaces of the individual and interior sites located away from the tips of the nanohorns. Results for the effective specific surface area, the kinetics of adsorption, and the isosteric heat of adsorption as a function of sorbent loading will be presented and compared to adsorption results with other sorbates on open carbon nanohorns. This work was supported by the NSF through Grant DMR-1006428.

  14. Cooking strongly coupled plasmas

    NASA Astrophysics Data System (ADS)

    Clérouin, Jean

    2015-09-01

    We present the orbital-free method for dense plasmas which allows for efficient variable ionisation molecular dynamics. This approach is a literal application of density functional theory where the use of orbitals is bypassed by a semi-classical estimation of the electron kinetic energy through the Thomas-Fermi theory. Thanks to a coherent definition of ionisation, we evidence a particular regime in which the static structure no longer depends on the temperature: the Γ-plateau. With the help of the well-known Thomas-Fermi scaling laws, we derive the conditions required to obtain a plasma at a given value of the coupling parameter and deduce useful fits. Static and dynamical properties are predicted as well as a a simple equation of state valid on the Γ-plateau. We show that the one component plasma model can be helpful to describe the correlations in real systems.

  15. Patterning of SU-8 resist structures using CF4

    NASA Astrophysics Data System (ADS)

    Vora, Kaushal D.; Holland, Anthony S.; Ghantasala, Muralidhar K.; Mitchell, Arnan

    2004-04-01

    Carbon Tetraflouride (CF4) plasma etching condition for SU-8 negative photoresist is characterized for its potential applications in photonics and bioMEMS. The effects of main plasma etching parameters such as rf power, gas flow rate, chamber pressure and time were systematically studied and the parameters were optimized by a three-level, L9 orthogonal array of the Taguchi method. By optimization, the optimal parameter range and the weighted percent of each parameter on the final results i.e. depth, surface roughness and wall angle were determined. Photoresist & metal were used and compared as masks for plasma etching. The minimum feature size was 1μm in both cases. Results indicated that with the increase of rf power, etch rate and roughness increases almost linearly. With increase in gas flow rate, etch rate increases while roughness decreases non-linearly. Etch rate is linear with time but roughness is significantly dependent on time initially. The side-wall angle of the samples with metal mask was found to be nearly 90° whereas samples with photoresist as the mask showed poor side-wall angle and surface roughness mainly due to poor mask-resist selectivity. Optimized values of rf power, gas flow rate, time and pressure were found to be 200W, 240sccm, 20minutes and 1Torr respectively, which yielded high etch rate (80nm/min), low surface roughness (5nm) and nearly vertical side-walls (89°).

  16. Inductively coupled helium plasma torch

    SciTech Connect

    Montaser, Akbar; Chan, Shi-Kit; Van Hoven, Raymond L.

    1989-01-01

    An inductively coupled plasma torch including a base member, a plasma tube and a threaded insert member within the plasma tube for directing the plasma gas in a tangential flow pattern. The design of the torch eliminates the need for a separate coolant gas tube. The torch can be readily assembled and disassembled with a high degree of alignment accuracy.

  17. A multi-scale approach to characterize pure CH4, CF4, and CH4/CF4 mixtures

    NASA Astrophysics Data System (ADS)

    Chattoraj, Joyjit; Risthaus, Tobias; Rubner, Oliver; Heuer, Andreas; Grimme, Stefan

    2015-04-01

    In this study, we develop three intermolecular potentials for methane (CH4), tetrafluoromethane (CF4), and CH4/CF4 dimers using a novel ab initio method. The ultimate goal is to understand microscopically the phase-separation in CH4/CF4 systems, which takes place in the liquid states near their freezing points. Monte-Carlo (MC) simulations of the pure CH4 system are performed using the ab initio energies to verify the potential. The simulations reproduce quite well the experimentally known liquid densities, the internal energies, the second virial coefficients, and the radial distribution function. The essentially six-dimensional (6D) ab initio potential is then reduced to a one-dimensional (1D) effective potential using the inverse Monte-Carlo technique. This potential, too, successfully reproduces the experimental results. Interestingly, the MC study cannot be extended to the pure CF4 system and the CH4/CF4 mixed system because the two respective ab initio potentials present very rough potential landscapes. This renders the interpolation of energies for the MC simulations and thus the multi-scale approach unreliable. It suggests, however, a possible driving force for the experimentally observed phase separation of the CH4/CF4 system at low temperatures. Furthermore, we carefully study the determination of 1D effective potentials via inverse MC techniques. We argue that to a good approximation the temperature dependence of the 1D potentials can be estimated via reweighting techniques for a fixed temperature.

  18. Detection of Chamber Conditioning by CF4 in the GEC Cell

    NASA Technical Reports Server (NTRS)

    Cruden, Brett A.; Rao, M. V. V. S.; Sharma, S. P.; Meyyappan, M.; Arnold, James (Technical Monitor)

    2001-01-01

    During oxide etch processes, buildup of fluorocarbon residues on reactor sidewalks can cause to drift and will necessitate time for conditioning and cleaning of the reactor. Various measurements in CF4 and Ar plasmas are made in an attempt to identify a metric able to indicate the chamber condition. Mass spectrometry and a Langmuir probe shows that the buildup of fluorocarbon films on the reactor surface causes a decrease in plasma floating potential, plasma potential, and ion energy in argon plasmas. This change in floating potential is also observed in CF4 plasma operation, and occurs primarily during the first hour and a half of plasma operation. A slight rise in electron density is also observed in the argon plasmas. Because the change is seen in an argon plasma, it is indicative of altered physical, not chemical, plasma-surface interactions. Specifically, the insulating films deposited on metal surfaces alter the electromagnetic fields seen by the plasma, affecting various parameters including the floating potential and electron density. An impedance probe placed on the inductive coil shows a slight reduction in plasma impedance due to this rising electron density. The optical emission of several species, including CF, C2, atomic Si and atomic C, is also monitored for changes in density resulting from the buildup of film on the chamber wall. Changes in the optical emission spectrum are comparable to the noise levels in their measurement.

  19. Quenching the scintillation in CF4 Cherenkov gas radiator

    NASA Astrophysics Data System (ADS)

    Blake, T.; D`Ambrosio, C.; Easo, S.; Eisenhardt, S.; Fitzpatrick, C.; Forty, R.; Frei, C.; Gibson, V.; Gys, T.; Harnew, N.; Hunt, P.; Jones, C. R.; Lambert, R. W.; Matteuzzi, C.; Muheim, F.; Papanestis, A.; Perego, D. L.; Piedigrossi, D.; Plackett, R.; Powell, A.; Topp-Joergensen, S.; Ullaland, O.; Websdale, D.; Wotton, S. A.; Wyllie, K.

    2015-08-01

    CF4 is used as a Cherenkov gas radiator in one of the Ring Imaging Cherenkov detectors at the LHCb experiment at the CERN Large Hadron Collider. CF4 is well known to have a high scintillation photon yield in the near and far VUV, UV and in the visible wavelength range. A large flux of scintillation photons in our photon detection acceptance between 200 and 800 nm could compromise the particle identification efficiency. We will show that this scintillation photon emission system can be effectively quenched, consistent with radiationless transitions, with no significant impact on the photons resulting from Cherenkov radiation.

  20. Closed inductively coupled plasma cell

    DOEpatents

    Manning, T.J.; Palmer, B.A.; Hof, D.E.

    1990-11-06

    A closed inductively coupled plasma cell generates a relatively high power, low noise plasma for use in spectroscopic studies is disclosed. A variety of gases can be selected to form the plasma to minimize spectroscopic interference and to provide a electron density and temperature range for the sample to be analyzed. Grounded conductors are placed at the tube ends and axially displaced from the inductive coil, whereby the resulting electromagnetic field acts to elongate the plasma in the tube. Sample materials can be injected in the plasma to be excited for spectroscopy. 1 fig.

  1. Closed inductively coupled plasma cell

    DOEpatents

    Manning, Thomas J.; Palmer, Byron A.; Hof, Douglas E.

    1990-01-01

    A closed inductively coupled plasma cell generates a relatively high power, low noise plasma for use in spectroscopic studies. A variety of gases can be selected to form the plasma to minimize spectroscopic interference and to provide a electron density and temperature range for the sample to be analyzed. Grounded conductors are placed at the tube ends and axially displaced from the inductive coil, whereby the resulting electromagnetic field acts to elongate the plasma in the tube. Sample materials can be injected in the plasma to be excited for spectroscopy.

  2. Etching of Copper Coated Mylar Tubes With CF-4 Gas

    DOE PAGESBeta

    Ecklund, Karl M.; Hartman, Keith W.; Hebert, Michael J.; Wojcicki, Stanley G.

    1996-04-01

    Using 5 mm diameter copper coated mylar straw tubes at a potential of 2.30 KV relative to a concentric 20 (mu)m diameter gold-plated tungsten anode, it has been observed that with very low flow rates of CF4-based gases the conductive copper cathode material may be removed entirely from the mylar surface.

  3. Perspectives on Geospace Plasma Coupling

    SciTech Connect

    Baker, Daniel N.

    2011-01-04

    There are a large variety of fascinating and instructive aspects to examining the coupling of mass and energy from the solar wind into the Earth's magnetosphere. Past research has suggested that magnetic reconnection (in a fluid sense) on the day-side magnetopause plays the key role in controlling the energy coupling. However, both linear and nonlinear coupling processes involving kinetic effects have been suggested through various types of innovative data analysis. Analysis and modeling results have also indicated a prominent role for multi-scale processes of plasma coupling. Examples include evidence of control by solar wind turbulence in the coupling sequence and localized (finite gyroradius) effects in dayside plasma transport. In this paper we describe several solar wind-magnetosphere coupling scenarios. We particularly emphasize the study of solar wind driving of magnetospheric substorm, and related geomagnetic disturbances.

  4. Langmuir Probe Measurements in an Inductively Coupled GEC Reference Cell Plasma

    NASA Technical Reports Server (NTRS)

    Ji, J. S.; Kim, J. S.; Cappelli, M. A.; Sharma, S. P.; Arnold, J. O. (Technical Monitor)

    1998-01-01

    Measurements of electron number density, electron temperature, and electron energy distribution function (EEDF) using a compensated Langmuir probe have been performed on an inductively (transformer ) coupled Gaseous Electronics Conference (GEC) reference cell plasma. The plasma source is operated with CH4, CF4, or their mixtures with argon. The effect of independently driving the electrode supporting the wafer on the probe data is studied. In particular, we find that the plasma structure depends on the phase in addition to the magnitude of the power coupled to the electrode relative to that of the transformer coil. The Langmuir probe is translated in a plane parallel to the electrode to investigate the spatial structure of the plasma. The probe data is also compared with fluid model predictions.

  5. Mobile inductively coupled plasma system

    DOEpatents

    D`Silva, A.P.; Jaselskis, E.J.

    1999-03-30

    A system is described for sampling and analyzing a material located at a hazardous site. A laser located remotely from the hazardous site is connected to an optical fiber, which directs laser radiation proximate the material at the hazardous site. The laser radiation abates a sample of the material. An inductively coupled plasma is located remotely from the material. An aerosol transport system carries the ablated particles to a plasma, where they are dissociated, atomized and excited to provide characteristic optical reduction of the elemental constituents of the sample. An optical spectrometer is located remotely from the site. A second optical fiber is connected to the optical spectrometer at one end and the plasma source at the other end to carry the optical radiation from the plasma source to the spectrometer. 10 figs.

  6. The ν2 + ν4 band of 12CF 4

    NASA Astrophysics Data System (ADS)

    Patterson, Chris W.; McDowell, Robin S.; Nereson, Norris G.; Begley, Richard F.; Galbraith, Harold W.; Krohn, Burton J.

    1980-03-01

    From a high-resolution diode laser spectrum of cooled 12CF 4, line assignments in ν2 + ν4 at 1066.4 cm -1 have been made for tetrahedral subspecies to J = 20, and in many cases to higher J. Spectroscopic constants have been obtained from a least-squares fit of the Hamiltonian, and the relative intensities of the assigned lines have been calculated. The ground- and excited-state rotational constants, Coriolis constant, and splitting of the F1 and F2 vibrational substates have the values a.The CF bond length in the ground vibrational state is thus r 0 = 1.31752 ± 0.00007 Å. The analysis of a combination band such as this provides a method of obtaining ground-state spectroscopic constants of spherical-top molecules directly from the infrared spectrum, without the necessity of measuring weak "forbidden" transitions. The assignments allow accurate predictions of the frequencies emitted by the CO 2-pumped CF 4 laser.

  7. Electron heating and the electrical asymmetry effect in dual-frequency capacitive CF4 discharges

    NASA Astrophysics Data System (ADS)

    Schulze, J.; Derzsi, A.; Donkó, Z.

    2011-08-01

    The electron heating and the electrical asymmetry effect (EAE) in electronegative dual-frequency capacitive CF4 discharges are investigated by particle-in-cell simulations and analytical modeling. One electrode is driven at 13.56 and 27.12 MHz with fixed but adjustable phase shift, θ, between the driving harmonics. First, the electron heating and ionization rates are studied, space and time resolved, for different phase shifts and pressures. The results are compared with those obtained for an electropositive gas (argon). In contrast to classical α- or γ-mode operation, we observe the electron heating and ionization rates to be high inside the bulk. This bulk heating mode is a consequence of the high electronegativity of CF4 discharges, where the conductivity in the bulk is low due to the low density of electrons. Thus, a high electric field builds up to drive the RF current through the bulk causing a high electron mean energy and ionization rate in the discharge center. Second, we investigate the consequences of the bulk heating on the EAE. We focus on the electrical generation of a dc self-bias as a function of θ and the quality of the separate control of the ion mean energy and flux at the electrodes by tuning θ. Compared with argon discharges the high voltage drop across the plasma bulk and the specific ionization dynamics affect the bias generation and the separate control of ion properties. These effects are described and explained by an analytical model.

  8. Estimation of Electron Temperature and Frequency Components in a Dual Frequency Capacitively-Coupled Plasma Processing Reactor

    NASA Astrophysics Data System (ADS)

    Ito, Toru; Mo, Yun; Masahiro, Horigome

    2008-10-01

    The measurement of electron temperature in RF plasma sources with Langmuir probes is difficult because of the influence of rf noise. We attempted to estimate the electron temperature in a capacitively-coupled plasma processing reactor with a Surface Wave Probe [1] which employs microwaves. We also estimated the frequency spectrum with the sensitive PAP [1, 2]. We measured the harmonics which appeared in the bulk plasma for various experimental conditions in the dual-frequency [60 MHz and 2MHz] capacitively-coupled plasma processing reactor. We estimated RF power spectra for several experimental conditions like RF power [500-2000W], gas pressure [3-20Pa], and gas species [Ar, CF4]. The measurement results suggest the existence of energy transport among several frequency spectrum. [1ex] [1] K. Nakamura, M. Ohata, and H. Sugai: J. Vac. Sci. Technol. A 21, 325 (2003). [0pt] [2] T. Shirakawa and H. Sugai : Jpn. J. Appl. Phys. 32, 5129 (1993).

  9. Comparative analysis of barium titanate thin films dry etching using inductively coupled plasmas by different fluorine-based mixture gas

    PubMed Central

    2014-01-01

    In this work, the inductively coupled plasma etching technique was applied to etch the barium titanate thin film. A comparative study of etch characteristics of the barium titanate thin film has been investigated in fluorine-based (CF4/O2, C4F8/O2 and SF6/O2) plasmas. The etch rates were measured using focused ion beam in order to ensure the accuracy of measurement. The surface morphology of etched barium titanate thin film was characterized by atomic force microscope. The chemical state of the etched surfaces was investigated by X-ray photoelectron spectroscopy. According to the experimental result, we monitored that a higher barium titanate thin film etch rate was achieved with SF6/O2 due to minimum amount of necessary ion energy and its higher volatility of etching byproducts as compared with CF4/O2 and C4F8/O2. Low-volatile C-F compound etching byproducts from C4F8/O2 were observed on the etched surface and resulted in the reduction of etch rate. As a result, the barium titanate films can be effectively etched by the plasma with the composition of SF6/O2, which has an etch rate of over than 46.7 nm/min at RF power/inductively coupled plasma (ICP) power of 150/1,000 W under gas pressure of 7.5 mTorr with a better surface morphology. PMID:25278821

  10. Adsorption of CF4 on graphite preplated with a monolayer of CF3Cl

    NASA Astrophysics Data System (ADS)

    Thomas, Petros; Velazquez, Daniel; Hess, George B.

    2011-03-01

    We report a study of the adsorption of CF4 on graphite preplated with a monolayer of CF3Cl, using infrared reflection absorption spectroscopy combined with ellipsometry. The saturated vapor pressure of CF3Cl is nearly 3 orders of magnitude smaller than that of CF4 at the same temperature, so the main control variables are the temperature and the pressure (or chemical potential) of CF4, together with the initial coverage of CF3Cl. The temperature range covered is 60-105 K. We find that, if the initial monolayer of CF3Cl is liquid, CF4 continuously displaces CF3Cl by substitution in the monolayer. If the initial monolayer of CF3Cl is solid, due to either lower temperature or compression, CF4 condenses as a second layer on the top of the CF3Cl layer, with only slight mixing with the original layer. This behavior persists to multiple layers of CF4.

  11. Increase of Stratospheric Carbon Tetrafluoride (CF4) Based on ATMOS Observations from Space

    NASA Technical Reports Server (NTRS)

    Zander, R.; Solomon, S.; Mahieu, E.; Goldman, A.; Rinsland, C. P.; Gunson, M. R.; Abrams, M. C.; Chang, A. Y.; Michelsen, H. A.; Newchurch, M. J.; Stiller, G. P.

    1996-01-01

    Stratospheric volume mixing ratio profiles of carbon tetrafluoride, CF4, obtained with the Atmospheric Trace Molecule Spectroscopy (ATMOS) instrument during the ATLAS (Atmospheric Laboratory for Applications and Science) -3 mission of 1994 are reported. Overall the profiles are nearly constant over the altitude range 20 to 50 km, indicative of the very long lifetime of CF4 in the atmosphere. In comparison to the stratospheric values of CF4 inferred from the ATMOS/Spacelab 3 mission of 1985, the 1994 concentrations are consistent with an exponential increase of (1.6 +/- 0.6)% yr(exp -1). This increase is discussed with regard to previous results and likely sources of CF4 at the ground. Further, it is shown that simultaneous measurements of N2O and CF4 provide a means of constraining the lower limit of the atmospheric lifetime of CF4 at least 2,300 years, two sigma.

  12. Characterization of the tomato Cf-4 gene for resistance to Cladosporium fulvum identifies sequences that determine recognitional specificity in Cf-4 and Cf-9.

    PubMed Central

    Thomas, C M; Jones, D A; Parniske, M; Harrison, K; Balint-Kurti, P J; Hatzixanthis, K; Jones, J D

    1997-01-01

    In many interactions between plants and their pathogens, resistance to infection is specified by plant resistance (R) genes and corresponding pathogen avirulence (Avr) genes. In tomato, the Cf-4 and Cf-9 resistance genes map to the same location but confer resistance to Cladosporium fulvum through recognition of different avirulence determinants (AVR4 and AVR9) by a molecular mechanism that has yet to be determined. Here, we describe the cloning and characterization of Cf-4, which also encodes a membrane-anchored extracellular glycoprotein. Cf-4 contains 25 leucine-rich repeats, which is two fewer than Cf-9. The proteins have > 91% identical amino acids. DNA sequence comparison suggests that Cf-4 and Cf-9 are derived from a common progenitor sequence. Amino acid differences distinguishing Cf-4 and Cf-9 are confined to their N termini, delimiting a region that determines the recognitional specificity of ligand binding. The majority of these differences are in residues interstitial to those of the leucine-rich repeat consensus motif. Many of these residues are predicted to form a solvent-exposed surface that can interact with the cognate ligand. Both Cf-4 and Cf-9 are located within a 36-kb region comprising five tandemly duplicated homologous genes. These results provide further insight into the molecular basis of pathogen perception by plants and the organization of complex R gene loci. PMID:9437864

  13. Evidence for crustal degassing of CF4 and SF6 in Mojave Desert groundwaters

    USGS Publications Warehouse

    Deeds, D.A.; Vollmer, M.K.; Kulongoski, J.T.; Miller, B.R.; Muhle, J.; Harth, C.M.; Izbicki, J.A.; Hilton, David R.; Weiss, R.F.

    2008-01-01

    Dissolved tetrafluoromethane (CF4) and sulfur hexafluoride (SF6) concentrations were measured in groundwater samples from the Eastern Morongo Basin (EMB) and Mojave River Basin (MRB) located in the southern Mojave Desert, California. Both CF4 and SF6 are supersaturated with respect to equilibrium with the preindustrial atmosphere at the recharge temperatures and elevations of the Mojave Desert. These observations provide the first in situ evidence for a flux of CF4 from the lithosphere. A gradual basin-wide enhancement in dissolved CF4 and SF6 concentrations with groundwater age is consistent with release of these gases during weathering of the surrounding granitic alluvium. Dissolved CF4 and SF6 concentrations in these groundwaters also contain a deeper crustal component associated with a lithospheric flux entering the EMB and MRB through the underlying basement. The crustal flux of CF4, but not of SF6, is enhanced in the vicinity of local active fault systems due to release of crustal fluids during episodic fracture events driven by local tectonic activity. When fluxes of CF4 and SF6 into Mojave Desert groundwaters are extrapolated to the global scale they are consistent, within large uncertainties, with the fluxes required to sustain the preindustrial atmospheric abundances of CF4 and SF6. ?? 2007 Elsevier Ltd. All rights reserved.

  14. Langmuir Probe Distortions and Probe Compensation in an Inductively Coupled Plasma

    NASA Technical Reports Server (NTRS)

    Ji, J. S.; Cappelli, M. A.; Kim, J. S.; Rao, M. V. V. S.; Sharma, S. P.

    1999-01-01

    In many RF discharges, Langmuir probe measurements are usually made against a background of sinusoidal (and not so sinusoidal) fluctuations in the plasma parameters such as the plasma potential (Vp), the electron number density (ne), and the electron temperature (Te). The compensation of sinusoidal fluctuations in Vp has been extensively studied and is relatively well understood. Less attention has been paid to the possible distortions introduced by small fluctuations in plasma density and/or plasma temperature, which may arise in the sheath and pre-sheath regions of RF discharges. Here, we present the results of a model simulation of probe characteristics subject to fluctuations in both Vp and ne. The modeling of probe distortion due to possible fluctuations in Te is less straightforward. A comparison is presented of calculations with experimental measurements using a compensated and uncompensated Langmuir probe in an inductively coupled GEC reference cell plasma, operating on Ar and Ar/CF4 mixtures. The plasma parameters determined from the compensated probe characteristics are compared to previous measurements of others made in similar discharges, and to our own measurements of the average electron density derived from electrical impedance measurements.

  15. Ignition delay of a pulsed inductively coupled plasma (ICP) in tandem with an auxiliary ICP

    NASA Astrophysics Data System (ADS)

    Liu, Lei; Sridhar, Shyam; Donnelly, Vincent M.; Economou, Demetre J.

    2015-12-01

    Plasma ignition delays were observed in a ‘main’ inductively coupled plasma (ICP), in tandem with an ‘auxiliary’ ICP. The Faraday-shielded ICPs were separated by a grounded metal grid. Power (13.56 MHz) to the main ICP was pulsed with a frequency of 1 kHz, while the auxiliary ICP was operated in continuous wave (cw) mode. In chlorine plasmas, ignition delay was observed for duty cycles greater than 60% and, in contrast to expectation, the delay was longer with increasing duty cycle up to ~99.5%. The ignition delay could be varied by changing the auxiliary and/or main ICP power. Langmuir probe measurements provided the temporal evolution of electron temperature, and electron and positive ion densities. These measurements revealed that the plasma was ignited shortly after the decaying positive ion density (n +), in the afterglow of the main ICP, reached the density ({{n}+},\\text{aux} ) prevailing when only the auxiliary ICP was powered. At that time, production of electrons began to dominate their loss in the main ICP, due to hot electron injection from the auxiliary ICP. As a result, {{n}\\text{e}} increased from a value below {{n}\\text{e,\\text{aux}}} , improving inductive power coupling efficiency, further increasing plasma density leading to plasma ignition. Plasma ignition delay occurred when the afterglow of the pulsed plasma was not long enough for the ion density to reach {{n}+},\\text{aux} during the afterglow. Besides Cl2, plasma ignition delays were also observed in other electronegative gases (SF6, CF4/O2 and O2) but not in an electropositive gas (Ar).

  16. Laser ablation inductively coupled plasma mass spectrometry

    SciTech Connect

    Durrant, S.F.

    1996-07-01

    Laser ablation for solid sample introduction to inductively coupled plasma mass spectrometry for bulk and spatially-resolved elemental analysis is briefly reviewed. {copyright} {ital 1996 American Institute of Physics.}

  17. Inductive coupled radio frequency plasma bridge neutralizer.

    PubMed

    Scholze, F; Tartz, M; Neumann, H

    2008-02-01

    A 13.56 MHz radio frequency plasma bridge neutralizer (rf-PBN) for ion thruster applications as well as ion beam surface processing of insulating materials is presented. The energy for the plasma excitation is inductively coupled into the plasma chamber. Because no components are located inside the plasma, the lifetime of the rf-PBN is expected to be very long. A compact tuning system adapts the input power to the plasma impedance. The electron current may be controlled over a wide range by the rf input power. An electron current of up to 1.6 A has been extracted. PMID:18315215

  18. Advances in Dusty Plasmas 5.Strongly Coupled Dusty Plasmas

    NASA Astrophysics Data System (ADS)

    Hamaguchi, Satoshi

    We review thermodynamical and dynamical properties of strongly coupled dusty plasmas, focusing on the recent development of molecular dynamics (MD) simulations. In the present paper, dusty plasmas are modeled by the Yukawa system, which is a collection of particles interacting through Yukawa (i.e., screened Coulomb) potentials. The phase diagram, wave dispersion relations and some transport coefficients of Yukawa systems are discussed.

  19. Description and preliminary calibration results for the Langley hypersonic CF4 tunnel

    NASA Technical Reports Server (NTRS)

    Midden, R. E.; Miller, C. G.

    1978-01-01

    A detailed description of the hypersonic CF4 tunnel is presented along with discussion of the basic components, instrumentation, and operating procedure. Operational experience with the CF4 reclaimer and lead-bath heater is discussed. Comparison of measured and predicted shock detachment distance on a sphere and pressure distributions measured on a sharp leading-edge flat plate revealed the absence of significant flow nonuniformity and lent creditability to predicted free stream flow conditions. The economic operation of this facility centers about the CF4 reclaimer, which was designed to operate at an efficiency of 90 to 95 percent. A number of modifications were made to the reclaimer system to improve its performance, and presently, the system reclaims approximately 75 percent of the test gas. Even with current budgetary constraints, this efficiency permits the CF4 tunnel to be operated as a viable research wind tunnel.

  20. Beam-Plasma Instabilities in Strongly Coupled Plasmas

    NASA Astrophysics Data System (ADS)

    Kalman, Gabor J.; Rosenberg, Marlene

    2001-10-01

    Strongly coupled dusty plasmas under laboratory conditions are permeated by streaming ions: in this scenario beam- plasma instabilities may be excited. The strong coupling between the dust grains, however, fundamentally affects the condition for instability and renders the conventional Vlasov treatment entirely inadequate. Based on the Quasilocalized Charge Approximation [1,2,3] we develop an analysis of instabilities generated by the relative streaming of a weakly coupled and a strongly coupled plasma. The central role in this formalism is played by the Dynamical Matrix D(k), a functional of the equilibrium correlation function, determined in our earlier work [2,3]. Novel physical effects generated by strong coupling alter both the beam resonance condition and the coupling between the beam and the plasma modes. Our analysis covers both resonant and non-resonant, as well as resistive instabilities. [1] Kenneth I. Golden and Gabor J. Kalman, Phys. Plasmas, 7, 14 (2000) [2] M. Rosenberg and G. Kalman, Phys. Rev. E 56, 7166 (1997) [3] G. Kalman, M.Rosenberg and H. E. DeWitt, Phys. Rev Lett. 84, 6030 (2000)

  1. High-energy negative ion beam obtained from pulsed inductively coupled plasma for charge-free etching process

    NASA Astrophysics Data System (ADS)

    Vozniy, O. V.; Yeom, G. Y.

    2009-06-01

    Negative ions in conventional inductively coupled plasma are often more chemically active than positive ions (for example, in CF4 or SF6 plasmas), but inconveniently they are trapped inside the sheath and cannot be used for high-energy surface etching in sources with a grid-type acceleration system. In this work we describe a method of positive and negative ion extraction that allows the energy and flux of oppositely charged particles to be varied independently. Then by scattering the ions off from a metal surface, it is possible to form a high-energy beam of neutrals from the negative ions by using the low-energy positive component of the beam current for better charge compensation.

  2. Adsorption of CF4 on graphite preplated with a monolayer of CF3Cl.

    PubMed

    Thomas, Petros; Velazquez, Daniel; Hess, George B

    2011-03-21

    We report a study of the adsorption of CF(4) on graphite preplated with a monolayer of CF(3)Cl, using infrared reflection absorption spectroscopy combined with ellipsometry. The saturated vapor pressure of CF(3)Cl is nearly 3 orders of magnitude smaller than that of CF(4) at the same temperature, so the main control variables are the temperature and the pressure (or chemical potential) of CF(4), together with the initial coverage of CF(3)Cl. The temperature range covered is 60-105 K. We find that, if the initial monolayer of CF(3)Cl is liquid, CF(4) continuously displaces CF(3)Cl by substitution in the monolayer. If the initial monolayer of CF(3)Cl is solid, due to either lower temperature or compression, CF(4) condenses as a second layer on the top of the CF(3)Cl layer, with only slight mixing with the original layer. This behavior persists to multiple layers of CF(4). PMID:21428651

  3. Characterization and Application of a Planar Radio - Inductively-Coupled Plasma Source for the Production of Barrier Coatings.

    NASA Astrophysics Data System (ADS)

    Mahoney, Leonard Joseph

    A planar radio-frequency (rf) inductively-coupled plasma (ICP) source is used to produce fluorocarbon discharges (CF_4/Ar) to fluorinate the surface of high-density polyethylene (HDPE). Using this system, concurrent studies of discharge characteristics, permeation properties of treated polymers and polymer surface characteristics are conducted to advance the use of plasma-fluorinated polymer surfaces as a barrier layer for automotive applications. Langmuir probes are used to determine spatial distribution of charged-particle and space-potential characteristics in Ar and CF_4/Ar discharges and to show the influence of the spatial distribution of the heating regions and the reactor boundaries on the discharge uniformity. Langmuir probes are also used to identify rf anisotropic drift motion of electrons in the heating regions of the source and transient high-energy electron features in pulsed discharges. These latter features allow pulsed ICP sources to be operated at low time-averaged powers that are necessary to treat thermally sensitive polymers. Fourier Transform Infrared (FITR) spectroscopy is used to measure the dissociation of fluorocarbon gases and to explore differences between pulsed- and continuous -power operation. Dissociation levels of CF_4 (50-85%) using pulsed-power operation are as high as that for continuous operation, even though the net time -averaged power is far less with pulsed operation. The result suggests that pulsed fluorocarbon discharges possess high concentrations of chemically-active species needed for rapid surface fluorination. A gravimetric permeation cup method is used to measure the permeation rate of test fuels through HDPE membranes, and electron spectroscopy for chemical analysis (ESCA) studies are performed to determine the stoichiometry and thickness of the barrier layer. From these studies we find that a 50-70 A thick, polar, fluoro-hydrocarbon over layer reduces the permeation of isooctane/toluene/methanol mixtures by a

  4. Atmospheric observations for quantifying emissions of point-source synthetic greenhouse gases (CF4, NF3 and HFC-23)

    NASA Astrophysics Data System (ADS)

    Arnold, Tim; Manning, Alistair J.; Li, Shanlan; Kim, Jooil; Park, Sunyoung; Fraser, Paul J.; Mitrevski, Blagoj; Steele, L. Paul; Krummel, Paul B.; Mühle, Jens; Weiss, Ray F.

    2016-04-01

    The fluorinated species carbon tetrafluoride (CF4; PFC-14), nitrogen trifluoride (NF3) and trifluoromethane (CHF3; HFC-23) are potent greenhouse gases with 100-year global warming potentials of 6,630, 16,100 and 12,400, respectively. Unlike the majority of CFC-replacement compounds that are emitted from fugitive and mobile emission sources, these gases are largely emitted from large single point sources - semiconductor manufacturing facilities (all three), aluminium smelting plants (CF4) and chlorodifluoromethane factories (HFC-23). In this work we show the potential for atmospheric measurements to understand regional sources of these gases and to highlight emission 'hotspots'. We target our analysis on measurements from two Advanced Global Atmospheric Gases Experiment (AGAGE) long term monitoring sites that are particularly sensitive to regional emissions of these gases: Gosan on Jeju Island in the Republic of Korea and Cape Grim on Tasmania in Australia. These sites measure CF4, NF3 and HFC-23 alongside a suite of greenhouse and stratospheric ozone depleting gases every two hours using automated in situ gas-chromatography mass-spectrometry instrumentation. We couple each measurement to an analysis of air history using the regional atmospheric transport model NAME (Numerical Atmospheric dispersion Modelling Environment) driven by 3D meteorology from the Met Office's Unified Model, and use a Bayesian inverse method (InTEM - Inversion Technique for Emission Modelling) to calculate yearly emission changes over a decade (2005-2015) at high spatial resolution. At present these gases make a small contribution to global radiative forcing, however, given that their impact could rise significantly and that point sources of such gases can be mitigated, atmospheric monitoring could be an important tool for aiding emissions reduction policy.

  5. Starter for inductively coupled plasma tube

    DOEpatents

    Hull, D.E.; Bieniewski, T.M.

    1988-08-23

    A starter assembly is provided for use with an inductively coupled plasma (ICP) tube to reliably initiate a plasma at internal pressures above about 30 microns. A conductive probe is inserted within the inductor coil about the tube and insulated from the tube shield assembly. A capacitive circuit is arranged for momentarily connecting a high voltage radio-frequency generator to the probe while simultaneously energizing the coil. When the plasma is initiated the probe is disconnected from the generator and electrically connected to the shield assembly for operation. 1 fig.

  6. Starter for inductively coupled plasma tube

    DOEpatents

    Hull, Donald E.; Bieniewski, Thomas M.

    1988-01-01

    A starter assembly is provided for use with an inductively coupled plasma (ICP) tube to reliably initate a plasma at internal pressures above about 30 microns. A conductive probe is inserted within the inductor coil about the tube and insulated from the tube shield assembly. A capacitive circuit is arranged for momentarily connecting a high voltage radio-frequency generator to the probe while simultaneously energizing the coil. When the plasma is initiated the probe is disconnected from the generator and electrically connected to the shield assembly for operation.

  7. An atmospheric photochemical source of the persistent greenhouse gas CF4

    NASA Astrophysics Data System (ADS)

    Jubb, Aaron M.; McGillen, Max R.; Portmann, Robert W.; Daniel, John S.; Burkholder, James B.

    2015-11-01

    A previously uncharacterized atmospheric source of the persistent greenhouse gas tetrafluoromethane, CF4, has been identified in the UV photolysis of trifluoroacetyl fluoride, CF3C(O)F, which is a degradation product of several halocarbons currently present in the atmosphere. CF4 quantum yields in the photolysis of CF3C(O)F were measured at 193, 214, 228, and 248 nm, wavelengths relevant to stratospheric photolysis, to be (75.3 ± 1) × 10-4, (23.7 ± 0.4) × 10-4, (6.6 ± 0.2) × 10-4, and ≤0.4 × 10-4, respectively. A 2-D atmospheric model was used to estimate the contribution of the photochemical source to the global CF4 budget. The atmospheric photochemical production of CF4 from CF3CH2F (HFC-134a), CF3CHFCl (HCFC-124), and CF3CCl2F (CFC-114a) per molecule emitted was calculated to be (1-2.5) × 10-5, 1.0 × 10-4, and 2.8 × 10-3, respectively. Although CF4 photochemical production was found to be relatively minor at the present time, the identified mechanism demonstrates that long-lived products with potential climate impacts can be formed from the atmospheric breakdown of shorter-lived source gases.

  8. Wavelength scaling of laser plasma coupling

    SciTech Connect

    Kruer, W.L.

    1983-11-03

    The use of shorter wavelength laser light both enhances collisional absorption and reduces deleterious collective plasma effects. Coupling processes which can be important in reactor-size targets are briefly reviewed. Simple estimates are presented for the intensity-wavelength regime in which collisional absorption is high and collective effects are minimized.

  9. Computational analysis and preliminary redesign of the nozzle contour of the Langley hypersonic CF4 tunnel

    NASA Technical Reports Server (NTRS)

    Thompson, R. A.; Sutton, Kenneth

    1987-01-01

    A computational analysis, modification, and preliminary redesign study was performed on the nozzle contour of the Langley Hypersonic CF4 Tunnel. This study showed that the existing nozzle was contoured incorrectly for the design operating condition, and this error was shown to produce the measured disturbances in the exit flow field. A modified contour was designed for the current nozzle downstream of the maximum turning point that would provide a uniform exit flow. New nozzle contours were also designed for an exit Mach number and Reynolds number combination which matches that attainable in the Langley 20-Inch Mach 6 Tunnel. Two nozzle contours were designed: one having the same exit radius but a larger mass flow rate than that of the existing CF4 Tunnel, and the other having the same mass flow rate but a smaller exit radius than that of the existing CF4 Tunnel.

  10. Enhanced laser beam coupling to a plasma

    DOEpatents

    Steiger, Arno D.; Woods, Cornelius H.

    1976-01-01

    Density perturbations are induced in a heated plasma by means of a pair of oppositely directed, polarized laser beams of the same frequency. The wavelength of the density perturbations is equal to one half the wavelength of the laser beams. A third laser beam is linearly polarized and directed at the perturbed plasma along a line that is perpendicular to the direction of the two opposed beams. The electric field of the third beam is oriented to lie in the plane containing the three beams. The frequency of the third beam is chosen to cause it to interact resonantly with the plasma density perturbations, thereby efficiently coupling the energy of the third beam to the plasma.

  11. Terrestrial Sources of Perfluorinated Gases: Excess CF4 and SF6 in Mojave Desert Groundwaters

    NASA Astrophysics Data System (ADS)

    Deeds, D. A.; Vollmer, M. K.; Kulongoski, J. T.; Miller, B. R.; Hilton, D. R.; Izbicki, J. A.; Harth, C. M.; Weiss, R. F.

    2004-12-01

    The recent discovery of perfluorinated gases in fluid inclusions of granites and fluorites suggests a geologic source for the estimated 40 parts-per-trillion (ppt) of tetrafluoromethane (CF4) and <0.006 ppt of sulfur hexafluoride (SF6) in the preindustrial atmosphere. The accumulation of these gases in groundwaters with long residence times enables the detection of even small emissions from the surrounding aquifer material. We have measured high concentrations of CF4 and SF6 in groundwaters from the Mojave Desert, California. Dissolved SF6 was extracted by a purge and trap technique and analyzed by gas chromatography with electron capture detection. Dissolved CF4 was sampled by headspace extraction, using liquid helium to cryofocus the analytes prior to injection into the Medusa gas chromatograph/quadrupole mass spectrometer analytical system. Current precisions and accuracies for these measurements are on the order of 2% for both gases. Initial measurements of dissolved CF4 concentrations range from ˜0.05 to ˜1.5 pmol kg-1, about 5 to 15 times higher than expected for water in equilibrium with the preindustrial atmosphere at the local temperature and altitude of the recharge site. SF6 concentrations range from ˜0.3 to ˜16 fmol kg-1, up to several thousand times higher than expected for air-saturated water. Taking into account the large uncertainties in the estimated preindustrial atmospheric concentration of SF6, and in the estimated atmospheric lifetimes of both SF6 and CF4, the ratio of their excess abundances in Mojave Desert groundwaters agrees within an order of magnitude with the estimated ratio of natural fluxes required to sustain their preindustrial atmospheric concentrations. Relationships among dissolved CF4 and SF6 concentrations and the other geochemical properties of the aquifer, including groundwater residence times (ages), helium abundances and isotopic ratios, and fluoride concentrations will be presented.

  12. Ion Energy Distributions and their Relative Abundance in Inductively Coupled Plasmas

    NASA Technical Reports Server (NTRS)

    Kim, J. S.; Rao, M. V. V. S.; Cappelli, M. A.; Sharma, S. P.; Arnold, James O. (Technical Monitor)

    1998-01-01

    Study of kinetics of ions and neutrals produced in high density inductively coupled plasma (ICP) discharges is of great importance for achieving a high degree of plasma assisted deposition and etching. In this paper, we present the ion energy distributions (IEDs) of various ions arriving at the grounded lower electrode. The ions were energy as well as mass analyzed by a combination of electrostatic analyzer-quadrupole mass spectrometer for pure Ar and CF4/Ar mixtures. The measurements have been made at gas pressures ranging from 30 to 100 mTorr. In addition, the IEDs were measured when the wafer-supporting electrode was also rf-powered and the effect of the self-bias was observed in the energy distributions of ions. The shapes of the IEDs are discussed an related to the sheath properties and measured electrical waveforms, as a function of pressure and applied power. Relative ion intensities were obtained by integration of each ion kinetic energy distribution function over its energy range.

  13. Design Considerations in Capacitively Coupled Plasmas

    NASA Astrophysics Data System (ADS)

    Song, Sang-Heon; Ventzek, Peter; Ranjan, Alok

    2015-11-01

    Microelectronics industry has driven transistor feature size scaling from 10-6 m to 10-9 m during the past 50 years, which is often referred to as Moore's law. It cannot be overstated that today's information technology would not have been so successful without plasma material processing. One of the major plasma sources for the microelectronics fabrication is capacitively coupled plasmas (CCPs). The CCP reactor has been intensively studied and developed for the deposition and etching of different films on the silicon wafer. As the feature size gets to around 10 nm, the requirement for the process uniformity is less than 1-2 nm across the wafer (300 mm). In order to achieve the desired uniformity, the hardware design should be as precise as possible before the fine tuning of process condition is applied to make it even better. In doing this procedure, the computer simulation can save a significant amount of resources such as time and money which are critical in the semiconductor business. In this presentation, we compare plasma properties using a 2-dimensional plasma hydrodynamics model for different kinds of design factors that can affect the plasma uniformity. The parameters studied in this presentation include chamber accessing port, pumping port, focus ring around wafer substrate, and the geometry of electrodes of CCP.

  14. Electron heating in capacitively coupled plasmas revisited

    NASA Astrophysics Data System (ADS)

    Lafleur, T.; Chabert, P.; Booth, J. P.

    2014-06-01

    We revisit the problem of electron heating in capacitively coupled plasmas (CCPs), and propose a method for quantifying the level of collisionless and collisional heating in plasma simulations. The proposed procedure, based on the electron mechanical energy conservation equation, is demonstrated with particle-in-cell simulations of a number of single and multi-frequency CCPs operated in regimes of research and industrial interest. In almost all cases tested, the total electron heating is comprised of collisional (ohmic) and pressure heating parts. This latter collisionless component is in qualitative agreement with the mechanism of electron heating predicted from the recent re-evaluation of theoretical models. Finally, in very electrically asymmetric plasmas produced in multi-frequency discharges, we observe an additional collisionless heating mechanism associated with electron inertia.

  15. Strongly coupled quark gluon plasma (SCQGP)

    NASA Astrophysics Data System (ADS)

    Bannur, Vishnu M.

    2006-07-01

    We propose that the reason for the non-ideal behaviour seen in lattice simulation of quark gluon plasma (QGP) and ultrarelativistic heavy ion collision experiments is that the QGP near Tc and above is a strongly coupled plasma (SCP), i.e., a strongly coupled quark gluon plasma (SCQGP). It is remarkable that the widely used equation of state of SCP in QED (quantum electrodynamics) very nicely fits lattice results on all QGP systems, with proper modifications to include colour degrees of freedom and the running coupling constant. Results on pressure in pure gauge, 2-flavours and 3-flavours QGP can all be explained by treating QGP as SCQGP, as demonstrated here. Energy density and speed of sound are also presented for all three systems. We further extend the model to systems with finite quark mass and reasonably good fits to lattice results are obtained for (2+1)-flavours and 4-flavours QGP. Hence it is a unified model, namely SCQGP, to explain the non-ideal QGP seen in lattice simulations with just two system dependent parameters.

  16. High-resolution spectroscopy of the 16-μm bending fundamental of CF 4

    NASA Astrophysics Data System (ADS)

    McDowell, Robin S.; Reisfeld, Martin J.; Galbraith, Harold W.; Krohn, Burton J.; Flicker, Herbert; Kennedy, R. Craig; Aldridge, Jack P.; Nereson, Norris G.

    1980-10-01

    The 16-μm bending fundamentals ( ν4) of 12CF 4, 13CF 4, and 14CF 4 have been observed at Doppler-limited resolution using a tunable PbSnSe semiconductor diode laser. The tetrahedral splittings of the rotational manifolds have been observed in all three branches, and in particular the dense and partially overlapping transitions in the Q branches have been resolved and assigned. A least-squares fit of the Hamiltonian, including off-diagonal terms, yielded five scalar and three tensor spectroscopic constants for each of the three isotopes. From these constants the upper-state rotational constant B4 and the Coriolis constant ζ4 have been calculated, together with some of the other molecular constants. An absorption feature at about 0.18 cm -1 to the red of the main Q branch of each isotopic species has been identified as the Q branch of ( ν2 + ν4) - ν2, which is the transition that lases when CF 4 is pumped by a CO 2 laser at 9.4 μm (i.e., in ν2 + ν4).

  17. Generalized hydrodynamics model for strongly coupled plasmas

    NASA Astrophysics Data System (ADS)

    Diaw, A.; Murillo, M. S.

    2015-07-01

    Beginning with the exact equations of the Bogoliubov-Born-Green-Kirkwood-Yvon hierarchy, we obtain the density, momentum, and stress tensor-moment equations. We close the moment equations with two closures, one that guarantees an equilibrium state given by density-functional theory and another that includes collisions in the relaxation of the stress tensor. The introduction of a density functional-theory closure ensures self-consistency in the equation-of-state properties of the plasma (ideal and excess pressure, electric fields, and correlations). The resulting generalized hydrodynamics thus includes all impacts of Coulomb coupling, viscous damping, and the high-frequency (viscoelastic) response. We compare our results with those of several known models, including generalized hydrodynamic theory and models obtained using the Singwi-Tosi-Land-Sjolander approximation and the quasilocalized charge approximation. We find that the viscoelastic response, including both the high-frequency elastic generalization and viscous wave damping, is important for correctly describing ion-acoustic waves. We illustrate this result by considering three very different systems: ultracold plasmas, dusty plasmas, and dense plasmas. The new model is validated by comparing its results with those of the current autocorrelation function obtained from molecular-dynamics simulations of Yukawa plasmas, and the agreement is excellent. Generalizations of this model to mixtures and quantum systems should be straightforward.

  18. Plasma transport theory spanning weak to strong coupling

    SciTech Connect

    Daligault, Jérôme; Baalrud, Scott D.

    2015-06-29

    We describe some of the most striking characteristics of particle transport in strongly coupled plasmas across a wide range of Coulomb coupling strength. We then discuss the effective potential theory, which is an approximation that was recently developed to extend conventional weakly coupled plasma transport theory into the strongly coupled regime in a manner that is practical to evaluate efficiently.

  19. Strongly-coupled plasmas formed from laser-heated solids

    PubMed Central

    Lyon, M.; Bergeson, S. D.; Hart, G.; Murillo, M. S.

    2015-01-01

    We present an analysis of ion temperatures in laser-produced plasmas formed from solids with different initial lattice structures. We show that the equilibrium ion temperature is limited by a mismatch between the initial crystallographic configuration and the close-packed configuration of a strongly-coupled plasma, similar to experiments in ultracold neutral plasmas. We propose experiments to demonstrate and exploit this crystallographic heating in order to produce a strongly coupled plasma with a coupling parameter of several hundred. PMID:26503293

  20. Strongly-coupled plasmas formed from laser-heated solids.

    PubMed

    Lyon, M; Bergeson, S D; Hart, G; Murillo, M S

    2015-01-01

    We present an analysis of ion temperatures in laser-produced plasmas formed from solids with different initial lattice structures. We show that the equilibrium ion temperature is limited by a mismatch between the initial crystallographic configuration and the close-packed configuration of a strongly-coupled plasma, similar to experiments in ultracold neutral plasmas. We propose experiments to demonstrate and exploit this crystallographic heating in order to produce a strongly coupled plasma with a coupling parameter of several hundred. PMID:26503293

  1. Interaction of O2 with CH4, CF4, and CCl4 by Molecular Beam Scattering Experiments and Theoretical Calculations.

    PubMed

    Cappelletti, David; Aquilanti, Vincenzo; Bartocci, Alessio; Nunzi, Francesca; Tarantelli, Francesco; Belpassi, Leonardo; Pirani, Fernando

    2016-07-14

    Gas phase collisions of O2 by CH4, CF4, and CCl4 have been investigated with the molecular beam technique by measuring both the integral cross section value, Q, and its dependence on the collision velocity, v. The adopted experimental conditions have been appropriate to resolve the oscillating "glory" pattern, a quantum interference effect controlled by the features of the intermolecular interaction, for all the three case studies. The analysis of the Q(v) data, performed by adopting a suitable representation of the intermolecular potential function, provided the basic features of the anisotropic potential energy surfaces at intermediate and large separation distances and information on the relative role of the physically relevant types of contributions to the global interaction. The present work demonstrates that while O2-CH4 and O2-CF4 are basically bound through the balance between size (Pauli) repulsion and dispersion attraction, an appreaciable intermolecular bond stabilization by charge transfer is operative in O2-CCl4. Ab initio calculations of the strength of the interaction, coupled with detailed analysis of electronic charge displacement promoted by the formation of the dimer, fully rationalizes the experimental findings. This investigation indicates that the interactions of O2, when averaged over its relative orientations, are similar to that of a noble gas (Ng), specifically Ar. We also show that the binding energy in the basic configurations of the prototypical Ng-CF4,CCl4 systems [ Cappelletti , D. ; Chem. Eur. J. 2015 , 21 , 6234 - 6240 ] can be reconstructed by using the interactions in Ng-F and Ng-Cl systems, previously characterized by molecular beam scattering experiments of state-selected halogen atom beams. This information is fundamental to approach the modeling of the weak intermolecular halogen bond. On the basis of the electronic polarizability, this also confirms [ Aquilanti , V. ; Angew. Chem., Int. Ed. 2005 , 44 , 2356 - 2360 ] that O2

  2. Titanium oxidation by rf inductively coupled plasma

    NASA Astrophysics Data System (ADS)

    Valencia-Alvarado, R.; de la Piedad-Beneitez, A.; López-Callejas, R.; Barocio, S. R.; Mercado-Cabrera, A.; Peña-Eguiluz, R.; Muñoz-Castro, A. E.; Rodríguez-Méndez, B. G.; de la Rosa-Vázquez, J. M.

    2014-05-01

    The development of titanium dioxide (TiO2) films in the rutile and anatase phases is reported. The films have been obtained from an implantation/diffusion and sputtering process of commercially pure titanium targets, carried out in up to 500 W plasmas. The experimental outcome is of particular interest, in the case of anatase, for atmospheric pollution degradation by photocatalysis and, as to the rutile phase, for the production of biomaterials required by prosthesis and implants. The reactor employed consists in a cylindrical pyrex-like glass vessel inductively coupled to a 13.56 MHz RF source. The process takes place at a 5×10-2 mbar pressure with the target samples being biased from 0 to -3000 V DC. The anatase phase films were obtained from sputtering the titanium targets over glass and silicon electrically floated substrates placed 2 cm away from the target. The rutile phase was obtained by implantation/diffusion on targets at about 700 °C. The plasma was developed from a 4:1 argon/oxygen mixture for ~5 hour processing periods. The target temperature was controlled by means of the bias voltage and the plasma source power. The obtained anatase phases did not require annealing after the plasma oxidation process. The characterization of the film samples was conducted by means of x-ray diffraction, scanning electron microscopy, x-ray photoelectron spectroscopy and Raman spectroscopy.

  3. Temperature equilibration in strongly coupled plasma

    SciTech Connect

    Thode, L. E.; Chang, C. H.; Snell, C. M.; Daughton, W. S.; Csanak, G. Y.

    2002-01-01

    A laser-driven experiment investigating electron-ion equilibration in strongly coupled plasma was performed in 1995. At that time, standard estimates for the electron-ion equilibration time were two-to-three orders of magnitude faster than observed experimentally. As a result, the electron-ion equilibration time was taken as a fitting parameter to understand the experimental results. Based upon guidance from nonequilibrium molecular dynamics mixture calculations 121 and comparison with strongly coupled resistivity experiments, we have developed a consistent binary collision model to understand the electron-ion equilibration experiment. The model has been implemented in a newly developed multi-species, multi-temperature physics code, which was used for simulation of the experiment. The resulting electron-ion exchange rate is close to the experiment, which is about three orders-of-magnitude slower than given by standard estimates, most of which is the result of a modified coulomb logarithm.

  4. Monte Carlo Simulation of Electron Swarm Parameters in the SF6/CF4 Gas Mixtures

    NASA Astrophysics Data System (ADS)

    Liu, Xueli; Xiao, Dengming

    2007-04-01

    We use a binary gas mixture Monte Carlo simulation model to calculate the electron transport parameters in SF6/CF4 mixtures in uniform electric fields. Electron collision cross section sets are assembled on the basis of the critical survey of Christophorou et al. [J. Phys. Chem. Ref. Data 25 (1996) 1341] for CF4 and Itoh et al. [J. Phys. D 21 (1988) 922] for SF6. The electron swarm parameters studied here are electron drift velocity, effective ionization coefficient and the ratio of longitudinal diffusion coefficient to mobility for the density-reduced electric field strength (E/N) in the range of 140≤ E/N≤ 600 Td (1 Td = 10-17 V cm2); the SF6 contents in the gas mixtures are 0, 20, 50, and 100%. The differences between the present calculated and measured values of Urquijo et al. [J. Phys. D 36 (2003) 3132] do not exceed the overall measured uncertainties for the parameters. To our knowledge, only Urquijo et al. [J. Phys. D 36 (2003) 3132] have measured the electron swarm parameters in SF6/CF4 gas mixtures by a pulsed Townsend technique; however, simulation results have scarcely been reported.

  5. Hypersonic lateral and directional stability characteristics of aeroassist flight experiment configuration in air and CF4

    NASA Technical Reports Server (NTRS)

    Micol, John R.; Wells, William L.

    1993-01-01

    Hypersonic lateral and directional stability characteristics measured on a 60 deg half-angle elliptical cone, which was raked at an angle of 73 deg from the cone centerline and with an ellipsoid nose (ellipticity equal to 2.0 in the symmetry plane), are presented for angles of attack from -10 to 10 deg. The high normal-shock density ratio of a real gas was simulated by tests at a Mach number of 6 in air and CF4 (density ratio equal to 5.25 and 12.0, respectively). Tests were conducted in air at Mach 6 and 10 and in CF4 at Mach 6 to examine the effects of Mach number, Reynolds number, and normal-shock density ratio. Changes in Mach number from 6 to 10 in air or in Reynolds number by a factor of 4 at Mach 6 had a negligible effect on lateral and directional stability characteristics. Variations in normal-shock density ratio had a measurable effect on lateral and directional aerodynamic coefficients, but no significant effect on lateral and directional stability characteristics. Tests in air and CF4 indicated that the configuration was laterally and directionally stable through the test range of angle of attack.

  6. Instabilities in a capacitively coupled oxygen plasma

    SciTech Connect

    Küllig, C. Wegner, Th. Meichsner, J.

    2015-04-15

    Periodic fluctuations in the frequency range from 0.3 to 3 kHz were experimentally investigated in capacitively coupled radio frequency (13.56 MHz) oxygen plasma. The Gaussian beam microwave interferometry directly provides the line integrated electron density fluctuations. A system of two Langmuir probes measured the floating potential spatially (axial, radial) and temporally resolved. Hence, the floating potential fluctuation development is mapped within the discharge volume and provides a kind of discharge breathing and no wave propagation. Finally, it was measured the optical emission pattern of atomic oxygen during the fluctuation as well as the RF phase resolved optical emission intensity at selected phase position of the fluctuation by an intensified charge-coupled device camera. The deduced excitation rate pattern reveals the RF sheath dynamics and electron heating mechanisms, which is changing between low and high electronegativity during a fluctuation cycle. A perturbation calculation was taken into account using a global model with 15 elementary collision processes in the balance equations for the charged plasma species (O{sub 2}{sup +}, e, O{sup −}, O{sub 2}{sup −}) and a harmonic perturbation. The calculated frequencies agree with the experimentally observed frequencies. Whereby, the electron attachment/detachment processes are important for the generation of this instability.

  7. Instabilities in a capacitively coupled oxygen plasma

    NASA Astrophysics Data System (ADS)

    Küllig, C.; Wegner, Th.; Meichsner, J.

    2015-04-01

    Periodic fluctuations in the frequency range from 0.3 to 3 kHz were experimentally investigated in capacitively coupled radio frequency (13.56 MHz) oxygen plasma. The Gaussian beam microwave interferometry directly provides the line integrated electron density fluctuations. A system of two Langmuir probes measured the floating potential spatially (axial, radial) and temporally resolved. Hence, the floating potential fluctuation development is mapped within the discharge volume and provides a kind of discharge breathing and no wave propagation. Finally, it was measured the optical emission pattern of atomic oxygen during the fluctuation as well as the RF phase resolved optical emission intensity at selected phase position of the fluctuation by an intensified charge-coupled device camera. The deduced excitation rate pattern reveals the RF sheath dynamics and electron heating mechanisms, which is changing between low and high electronegativity during a fluctuation cycle. A perturbation calculation was taken into account using a global model with 15 elementary collision processes in the balance equations for the charged plasma species ( O2+, e , O-, O2- ) and a harmonic perturbation. The calculated frequencies agree with the experimentally observed frequencies. Whereby, the electron attachment/detachment processes are important for the generation of this instability.

  8. Laser Plasma Coupling for High Temperature Hohlraums

    SciTech Connect

    Kruer, W.

    1999-11-04

    Simple scaling models indicate that quite high radiation temperatures can be achieved in hohlraums driven with the National Ignition Facility. A scaling estimate for the radiation temperature versus pulse duration for different size NIF hohlraums is shown in Figure 1. Note that a radiation temperature of about 650 ev is projected for a so-called scale 1 hohlraum (length 2.6mm, diameter 1.6mm). With such high temperature hohlraums, for example, opacity experiments could be carried out using more relevant high Z materials rather than low Z surrogates. These projections of high temperature hohlraums are uncertain, since the scaling model does not allow for the very strongly-driven laser plasma coupling physics. Lasnex calculations have been carried out to estimate the plasma and irradiation conditions in a scale 1 hohlraum driven by NIF. Linear instability gains as high as exp(100) have been found for stimulated Brillouin scattering, and other laser-driven instabilities are also far above their thresholds. More understanding of the very strongly-driven coupling physics is clearly needed in order to more realistically assess and improve the prospects for high temperature hohlraums. Not surprisingly, this regime has been avoided for inertial fusion applications and so is relatively unexplored.

  9. Electrical Coupling Efficiency of Inductive Plasma Accelerators

    NASA Technical Reports Server (NTRS)

    Martin, Adam K.; Eskridge, Richard H.

    2005-01-01

    A single-stage pulsed inductive plasma accelerator is modeled as an inductive mass-driver. The plasma is treated as a rigid slug, which acts as the armature. The system is a transformer, with the drive coil serving as the primary and the slug as the secondary. We derive a set of coupled dynamic-circuit equations, which depend on five dimensionless coefficients, and on the functional form of the mutual inductance profile, M (z). For a given coil geometry, M (z) was determined experimentally and compared to the results of calculations carried out with QuickField. The equations are solved with various coefficient values, in order to determine the conditions that yield high efficiencies. It was found that the coupling efficiency can be quite high and likely scales with power, although this does not preclude operation at lower power with acceptable efficiency. The effect of an imbedded magnetic bias flux, as for the case of a plasmoid thruster, was also included in the calculations.

  10. Tailored Voltage Waveform Capacitively-Coupled Plasmas

    NASA Astrophysics Data System (ADS)

    Booth, Jean-Paul; Lafleur, Trevor; Delattre, Pierre-Alexandre; Johnson, Erik

    2012-10-01

    A major limitation of large-area capacitively-coupled plasmas for materials processing is the inability to increase plasma density without increasing ion bombardment energy. Heil et al. (J. Phys. D 41. 165202, (2008)) demonstrated that for a driving voltage comprising one frequency, f, and it's harmonic 2f, the symmetry of the sheaths can be broken (the Electrical Asymmetry Effect, EAE). We have investigated large-area plasmas (50cm dia) in Ar driven by arbitrary voltage waveforms. Specifically we studied waveforms comprising sharp positive pulses (10-20ns wide, 15MHz repetition frequency). The voltage waveform was measured by an HV probe close to the powered electrode edge, the electron density was measured with a microwave hairpin resonator, the ion flux was measured by an array of planar ion flux probes in the grounded counter-electrode, and the power absorbed was determined from the current and voltage waveforms measured by a derivative probe. As well as the expected EAE observed in the electrode self-bias, we were able to demonstrate a dramatic increase in electron density (and concomitant increased power absorption) with reduced pulse-width at constant amplitude, in qualitative agreement with recent PIC simulations (Lafleur et al, APL 100, 194101(2012)).

  11. Experimental Observation and Computational Analysis of Striations in Electronegative Capacitively Coupled Radio-Frequency Plasmas

    NASA Astrophysics Data System (ADS)

    Liu, Yong-Xin; Schüngel, Edmund; Korolov, Ihor; Donkó, Zoltán; Wang, You-Nian; Schulze, Julian

    2016-06-01

    Self-organized spatial structures in the light emission from the ion-ion capacitive rf plasma of a strongly electronegative gas (CF4 ) are observed experimentally for the first time. Their formation is analyzed and understood based on particle-based kinetic simulations. These "striations" are found to be generated by the resonance between the driving radio frequency and the eigenfrequency of the ion-ion plasma (derived from an analytical model) that establishes a modulation of the electric field, the ion densities, as well as the energy gain and loss processes of electrons in the plasma. The growth of the instability is followed by the numerical simulations.

  12. Method of processing materials using an inductively coupled plasma

    DOEpatents

    Hull, Donald E.; Bieniewski, Thomas M.

    1990-01-01

    A method for making fine power using an inductively coupled plasma. The method provides a gas-free environment, since the plasma is formed without using a gas. The starting material used in the method is in solid form.

  13. Laser Ablation Inductively Coupled Plasma Mass Spectrometry

    PubMed Central

    Hutchinson, Robert W.; McLachlin, Katherine M.; Riquelme, Paloma; Haarer, Jan; Broichhausen, Christiane; Ritter, Uwe; Geissler, Edward K.; Hutchinson, James A.

    2015-01-01

    ABSTRACT New analytical techniques for multiparametric characterisation of individual cells are likely to reveal important information about the heterogeneity of immunological responses at the single-cell level. In this proof-of-principle study, laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) was applied to the problem of concurrently detecting 24 lineage and activation markers expressed by human leucocytes. This approach was sufficiently sensitive and specific to identify subpopulations of isolated T, B, and natural killer cells. Leucocyte subsets were also accurately detected within unfractionated peripheral blood mononuclear cells preparations. Accordingly, we judge LA-ICP-MS to be a suitable method for assessing expression of multiple tissue antigens in solid-phase biological specimens, such as tissue sections, cytospins, or cells grown on slides. These results augur well for future development of LA-ICP-MS–based bioimaging instruments for general users. PMID:27500232

  14. Intelligent autonomous inductively coupled plasma instrumental operation

    NASA Astrophysics Data System (ADS)

    Webb, Douglas P.

    The development of a framework for the automated analysis of inductively couple plasma atomic emission spectroscopy is present. Some of the research that lead to current state of this framework is presented. A small expert system that uses information about the current sample to generate a line search strategy which minimizes the number of emission lines which need to be measured, and avoids spectral overlaps when possible. A program is presented that evaluates the minimum number of spectral windows required to perform elemental analysis by ICP- AES, given a certain spectral window width. A method with the potential for rapidly ascertaining the physical properties of the sample matrix is presented. This system has the potential to help reduce sample introduction related system failures. Finally, three optimization algorithms are compared in their ability to optimize ICP- AES performance, from this an optimization module was developed for inclusion in the automated analysis framework.

  15. Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: II. Scaling with pressure, power and electronegativity

    NASA Astrophysics Data System (ADS)

    Yang, Yang; Kushner, Mark J.

    2010-10-01

    The trend in dielectric etching in microelectronics fabrication with capacitively coupled plasmas is the use of multiple frequencies where a high frequency (HF, tens to hundreds of MHz) dominates ionization and a low frequency (LF, a few to tens MHz) is used to control ion energy distributions to the wafer. Process parameters, such as pressure, gas mixture and LF and HF power deposition, are important to determining the uniformity of the plasma and properties of ions incident on the wafer. In this paper, we report on a computational investigation of the consequences of these parameters on uniformity and ion energy distributions to the wafer in a dual frequency capacitively coupled plasma reactor sustained in Ar/CF4 gas mixtures. Due to the coupling of finite wavelength, electromagnetic skin, electrostatic edge and electronegative effects, there are no simple scaling laws for plasma uniformity. The plasma uniformity is ultimately a function of conductivity and energy relaxation distance of electrons accelerated by electric fields in and near the sheath. There is a strong second-order effect on uniformity due to feedback from the electron energy distributions (EEDs) to ionization sources. The trends from our parametric study are correlated with the spatial variation of the HF electric field, to the total power deposition and to the spatial variation of EEDs and ionization sources.

  16. Stochastic properties of strongly coupled plasmas.

    PubMed

    Morozov, I V; Norman, G E; Valuev, A A

    2001-03-01

    Stochastic properties of equilibrium strongly coupled plasmas are investigated by a molecular dynamics method. The Krylov-Kolmogorov entropy K and the dynamical memory time t(m) are calculated both for electrons and ions with mass ratios 10-10(5). Two values of K entropy for ions are discovered corresponding to electron and ion time scales. The dependence of the K entropy on the number of particles, the nonideality parameter, and the form of the interaction potential is investigated. The problem of the accuracy of molecular dynamics simulations is discussed. A universal relation between Kt(m) and the fluctuation of the total energy of the system is obtained. The relation does not depend on the numerical integration scheme, temperature, density, and the interparticle interaction potential, so that it may be applied to arbitrary dynamic systems. Transition from dynamic to stochastic correlation is treated for both electron and ion velocity autocorrelation functions, for Langmuir and ion-sound plasma wave dynamic structure factors. We point to quantum uncertainty as a physical reason which limits dynamic (Newton) correlation for times greater than t(m). PMID:11308773

  17. Identification of the V3 vibration-rotation band of CF4 in balloon-borne infrared solar spectra

    NASA Technical Reports Server (NTRS)

    Goldman, A.; Murcray, D. G.; Murcray, F. J.; Cook, G. R.; Van Allen, J. W.; Bonomo, F. S.; Blatherwick, R. D.

    1979-01-01

    Infrared solar spectra in the 850 to 1350/cm region, at 0.02/cm resolution, were obtained during a balloon flight made on 27 October 1978 from Alamogordo, New Mexico. Analysis of the 1275-1290/cm region indicates that the atmospheric absorption lines of CH4, N2O, H2O, HNO3 and CO2 near 1283/cm are super-imposed on a broader absorption feature which we interpret as due to the V3 band of CF4. Fine structure of CF4 is also identified. Preliminary estimates from the sunset spectra show approximately 75 pptv CF4 near 25 km.

  18. Measuring nanopore size from the spin-lattice relaxation of CF4 gas

    PubMed Central

    Kuethe, Dean O.; Montaño, Rebecca; Pietraß, Tanja

    2007-01-01

    The NMR 19F spin-lattice relaxation time constant T1 for CF4 gas is dominated by spin–rotation interaction, which is mediated by the molecular collision frequency. When confined to pores of approximately the same size or smaller than the bulk gas mean free path, additional collisions of molecules with the pore walls should substantially change T1. To develop a method for measuring the surface/volume ratio S/V by measuring how T1 changes with confinement, we prepared samples of known S/V from fumed silica of known mass-specific surface area and compressed to varying degrees into cylinders of known volume. We then measured T1 for CF4 in these samples at varying pressures, and developed mathematical models for the change in T1 to fit the data. Even though CF4 has a critical temperature below room temperature, we found that its density in pores was greater than that of the bulk gas and that it was necessary to take this absorption into account. We modeled adsorption in two ways, by assuming that the gas condenses on the pore walls, and by assuming that gas in a region near the wall is denser than the bulk gas because of a simplified attractive potential. Both models suggested the same two-parameter formula, to which we added a third parameter to successfully fit the data and thus achieved a rapid, precise way to measure S/V from the increase in T1 due to confinement in pores. PMID:17400493

  19. Thermophysical properties of CF4/O2 and SF6/O2 gas mixtures

    NASA Astrophysics Data System (ADS)

    Damyanova, M.; Hohm, U.; Balabanova, E.; Barton, D.

    2016-03-01

    Fitting formulae are presented for the calculation of the second interaction virial coefficients, mixture viscosities and binary diffusion coefficients for CF4/O2 and SF6/O2 gas mixtures in the temperature range between 200 K and 1000 K. The data recommended are obtained from the isotropic (n-6) Lennard-Jones intermolecular interaction potentials of the pure substances by using the Hohm-Zarkova-Damyanova mixing rules. In general, a good agreement is observed between our results and the experimental and theoretical data found in the literature.

  20. Tailored voltage waveform capacitively coupled plasmas in electronegative gases: frequency dependence of asymmetry effects

    NASA Astrophysics Data System (ADS)

    Schüngel, E.; Korolov, I.; Bruneau, B.; Derzsi, A.; Johnson, E.; O’Connell, D.; Gans, T.; Booth, J.-P.; Donkó, Z.; Schulze, J.

    2016-07-01

    Capacitively coupled radio frequency plasmas operated in an electronegative gas (CF4) and driven by voltage waveforms composed of four consecutive harmonics are investigated for different fundamental driving frequencies using PIC/MCC simulations and an analytical model. As has been observed previously for electropositive gases, the application of peak-shaped waveforms (that are characterized by a strong amplitude asymmetry) results in the development of a DC self-bias due to the electrical asymmetry effect (EAE), which increases the energy of ions arriving at the powered electrode. In contrast to the electropositive case (Korolov et al 2012 J. Phys. D: Appl. Phys. 45 465202) the absolute value of the DC self-bias is found to increase as the fundamental frequency is reduced in this electronegative discharge, providing an increased range over which the DC self-bias can be controlled. The analytical model reveals that this increased DC self-bias is caused by changes in the spatial profile and the mean value of the net charge density in the grounded electrode sheath. The spatio-temporally resolved simulation data show that as the frequency is reduced the grounded electrode sheath region becomes electronegative. The presence of negative ions in this sheath leads to very different dynamics of the power absorption of electrons, which in turn enhances the local electronegativity and plasma density via ionization and attachment processes. The ion flux to the grounded electrode (where the ion energy is lowest) can be up to twice that to the powered electrode. At the same time, while the mean ion energies at both electrodes are quite different, their ratio remains approximately constant for all base frequencies studied here.

  1. Irregularities in electronegative plasmas due to ion-ion coupling

    SciTech Connect

    Vitello, P.

    1999-07-01

    In partially ionized electronegative plasmas at low neutral pressure and high plasma density, coupling between positive and negative ions through space charge effects and through Coulomb scattering can lead to turbulence and irregularities in the ion density and flux. In this regime, the force on ions due to ion-ion coulomb scattering may dominate that from ion scattering with neutrals. This can lead to the formation of a, possibly turbulent, negative ion boundary layer containing the bulk of the negative ions. Commercial inductively Coupled Plasmas reactors used in the semiconductor industry typically operate at low pressure and high plasma density. Simulations are presented for a Chlorine discharge in the GEC reactor modified for Inductively Coupled operation. Results show that ion-ion coupling can induce large variations in the plasma density, and that accurate modeling of spatial plasma structure should include these effects.

  2. Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4

    NASA Astrophysics Data System (ADS)

    Brandt, S.; Berger, B.; Schüngel, E.; Korolov, I.; Derzsi, A.; Bruneau, B.; Johnson, E.; Lafleur, T.; O’Connell, D.; Koepke, M.; Gans, T.; Booth, J.-P.; Donkó, Z.; Schulze, J.

    2016-08-01

    The power absorption dynamics of electrons and the electrical asymmetry effect in capacitive radio-frequency plasmas operated in CF4 and driven by tailored voltage waveforms are investigated experimentally in combination with kinetic simulations. The driving voltage waveforms are generated as a superposition of multiple consecutive harmonics of the fundamental frequency of 13.56 MHz. Peaks/valleys and sawtooth waveforms are used to study the effects of amplitude and slope asymmetries of the driving voltage waveform on the electron dynamics and the generation of a DC self-bias in an electronegative plasma at different pressures. Compared to electropositive discharges, we observe strongly different effects and unique power absorption dynamics. At high pressures and high electronegativities, the discharge is found to operate in the drift-ambipolar (DA) heating mode. A dominant excitation/ionization maximum is observed during sheath collapse at the edge of the sheath which collapses fastest. High negative-ion densities are observed inside this sheath region, while electrons are confined for part of the RF period in a potential well formed by the ambipolar electric field at this sheath edge and the collapsed (floating potential) sheath at the electrode. For specific driving voltage waveforms, the plasma becomes divided spatially into two different halves of strongly different electronegativity. This asymmetry can be reversed electrically by inverting the driving waveform. For sawtooth waveforms, the discharge asymmetry and the sign of the DC self-bias are found to reverse as the pressure is increased, due to a transition of the electron heating mode from the α-mode to the DA-mode. These effects are interpreted with the aid of the simulation results.

  3. Coupled Langmuir oscillations in 2-dimensional quantum plasmas

    SciTech Connect

    Akbari-Moghanjoughi, M.

    2014-03-15

    In this work, we present a hydrodynamic model to study the coupled quantum electron plasma oscillations (QEPO) for two dimensional (2D) degenerate plasmas, which incorporates all the essential quantum ingredients such as the statistical degeneracy pressure, electron-exchange, and electron quantum diffraction effect. Effects of diverse physical aspects like the electronic band-dispersion effect, the electron exchange-correlations and the quantum Bohm-potential as well as other important plasma parameters such as the coupling parameter (plasma separation) and the plasma electron number-densities on the linear response of the coupled system are investigated. By studying three different 2D plasma coupling types, namely, graphene-graphene, graphene-metalfilm, and metalfilm-metalfilm coupling configurations, it is remarked that the collective quantum effects can influence the coupled modes quite differently, depending on the type of the plasma configuration. It is also found that the slow and fast QEPO frequency modes respond very differently to the change in plasma parameters. Current findings can help in understanding of the coupled density oscillations in multilayer graphene, graphene-based heterojunctions, or nanofabricated integrated circuits.

  4. Plasma sweeper to control the coupling of RF power to a magnetically confined plasma

    DOEpatents

    Motley, Robert W.; Glanz, James

    1985-01-01

    A device for coupling RF power (a plasma sweeper) from a phased waveguide array for introducing RF power to a plasma having a magnetic field associated therewith comprises at least one electrode positioned near the plasma and near the phased waveguide array; and a potential source coupled to the electrode for generating a static electric field at the electrode directed into the plasma and having a component substantially perpendicular to the plasma magnetic field such that a non-zero vector cross-product of the electric and magnetic fields exerts a force on the plasma causing the plasma to drift.

  5. Plasma sweeper to control the coupling of RF power to a magnetically confined plasma

    SciTech Connect

    Motley, R.W.; Glanz, J.

    1985-04-16

    A device for coupling RF power (a plasma sweeper) from a phased waveguide array for introducing RF power to a plasma having a magnetic field associated therewith comprises at least one electrode positioned near the plasma and near the phased waveguide array; and a potential source coupled to the electrode for generating a static electric field at the electrode directed into the plasma and having a component substantially perpendicular to the plasma magnetic field such that a non-zero vector cross-product of the electric and magnetic fields exerts a force on the plasma causing the plasma to drift.

  6. Shear viscosities of photons in strongly coupled plasmas

    NASA Astrophysics Data System (ADS)

    Yang, Di-Lun; Müller, Berndt

    2016-09-01

    We investigate the shear viscosity of thermalized photons in the quark gluon plasma (QGP) at weak coupling and N = 4 super Yang-Mills plasma (SYMP) at both strong and weak couplings. We find that the shear viscosity due to the photon-parton scattering up to the leading order of electromagnetic coupling is suppressed when the coupling of the QGP/SYMP is increased, which stems from the blue-shift of the thermal-photon spectrum at strong coupling. In addition, the shear viscosity rapidly increases near the deconfinement transition in a phenomenological model analogous to the QGP.

  7. Synchronization between two coupled direct current glow discharge plasma sources

    SciTech Connect

    Chaubey, Neeraj; Mukherjee, S.; Sen, A.; Sekar Iyengar, A. N.

    2015-02-15

    Experimental results on the nonlinear dynamics of two coupled glow discharge plasma sources are presented. A variety of nonlinear phenomena including frequency synchronization and frequency pulling are observed as the coupling strength is varied. Numerical solutions of a model representation of the experiment consisting of two coupled asymmetric Van der Pol type equations are found to be in good agreement with the observed results.

  8. Mode-coupling instability of monolayer complex (dusty) plasmas

    NASA Astrophysics Data System (ADS)

    Zhdanov, Sergey; Ivlev, Alexei; Morfill, Gregor

    2010-05-01

    Strongly coupled complex (dusty) plasmas give us a unique opportunity to go beyond the limits of continuous media and study various generic processes occurring in liquids or solids, in regimes ranging from the onset of cooperative phenomena to large strongly coupled systems at the most detailed kinetic (atomistic) level. On the other hand, there is certain peculiarity of the interparticle interactions in complex plasmas. This can be easily understood if we divide the complete set of elementary charges in complex plasmas into two distinct categories - a subsystem of charges bound to the microparticles, and a subsystem of free plasma charges in the surrounding wakes. Plasma wakes play the role of a "third body" in the mutual particle-particle interaction and, hence, make the pair interaction nonreciprocal. We carried out rigorous theoretical investigation of the DL wave mode coupling occurring in 2D complex plasmas due to particle-wake interactions. The analysis of the mode coupling shows that if the strength of the vertical confinement is below a certain critical value, then resonance coupling between the longitudinal in-plane mode and out-of-plane mode sets in. This results in the emergence of a hybrid mode and drives the mode-coupling instability. The universal dependence of the critical confinement frequency on plasma parameters is calculated, which allows us to specify the conditions when stable 2D highly ordered complex plasma can be formed in experiments.

  9. EVALUATION OF AN INDUCTIVELY COUPLED PLASMA, MULTICHANNEL SPECTROMETRIC ANALYSIS SYSTEM

    EPA Science Inventory

    An inductively coupled plasma, multielement atomic emission spectrometric analysis system has been evaluated with respect to the Environmental Protection Agency's need for a rapid method for determination of trace elemental concentrations in water. Data are presented on detection...

  10. Avr4 promotes Cf-4 receptor-like protein association with the BAK1/SERK3 receptor-like kinase to initiate receptor endocytosis and plant immunity.

    PubMed

    Postma, Jelle; Liebrand, Thomas W H; Bi, Guozhi; Evrard, Alexandre; Bye, Ruby R; Mbengue, Malick; Kuhn, Hannah; Joosten, Matthieu H A J; Robatzek, Silke

    2016-04-01

    The first layer of plant immunity is activated by cell surface receptor-like kinases (RLKs) and proteins (RLPs) that detect infectious pathogens. Constitutive interaction with the SUPPRESSOR OF BIR1 (SOBIR1) RLK contributes to RLP stability and kinase activity. As RLK activation requires transphosphorylation with a second associated RLK, it remains elusive how RLPs initiate downstream signaling. We employed live-cell imaging, gene silencing and coimmunoprecipitation to investigate the requirement of associated kinases for functioning and ligand-induced subcellular trafficking of Cf RLPs that mediate immunity of tomato against Cladosporium fulvum. Our research shows that after elicitation with matching effector ligands Avr4 and Avr9, BRI1-ASSOCIATED KINASE 1/SOMATIC EMBRYOGENESIS RECEPTOR KINASE 3 (BAK1/SERK3) associates with Cf-4 and Cf-9. BAK1/SERK3 is required for the effector-triggered hypersensitive response and resistance of tomato against C. fulvum. Furthermore, Cf-4 interacts with SOBIR1 at the plasma membrane and is recruited to late endosomes upon Avr4 trigger, also depending on BAK1/SERK3. These observations indicate that RLP-mediated resistance and endocytosis require ligand-induced recruitment of BAK1/SERK3, reminiscent of BAK1/SERK3 interaction and subcellular fate of the FLAGELLIN SENSING 2 (FLS2) RLK. This reveals that diverse classes of cell surface immune receptors share common requirements for initiation of resistance and endocytosis. PMID:26765243

  11. Inductively coupled plasma etching of GaN

    SciTech Connect

    Shul, R.J.; McClellan, G.B.; Casalnuovo, S.A.; Rieger, D.J.; Pearton, S.J.; Constantine, C.; Barratt, C.; Karlicek, R.F. Jr.; Tran, C.; Schurman, M.

    1996-08-01

    Inductively coupled plasma (ICP) etch rates for GaN are reported as a function of plasma pressure, plasma chemistry, rf power, and ICP power. Using a Cl{sub 2}/H{sub 2}/Ar plasma chemistry, GaN etch rates as high as 6875 A/min are reported. The GaN surface morphology remains smooth over a wide range of plasma conditions as quantified using atomic force microscopy. Several etch conditions yield highly anisotropic profiles with smooth sidewalls. These results have direct application to the fabrication of group-III nitride etched laser facets. {copyright} {ital 1996 American Institute of Physics.}

  12. Visco-elastic effects in strongly coupled dusty plasmas

    SciTech Connect

    Bandyopadhyay, P.; Prasad, G.; Sen, A.; Kaw, P. K.

    2008-09-07

    We report on experimental evidence of visco-elastic effects in a strongly coupled dusty plasma through investigations of the propagation characteristics of low frequency dust acoustic waves and by excitations of transverse shear waves in a DC discharge Argon plasma.

  13. Method of processing materials using an inductively coupled plasma

    DOEpatents

    Hull, Donald E.; Bieniewski, Thomas M.

    1989-01-01

    A method for coating surfaces or implanting ions in an object using an inductively coupled plasma. The method provides a gas-free environment, since the plasma is formed without using a gas. The coating material or implantation material is intitially in solid form.

  14. Ion-wave stabilization of an inductively coupled plasma

    SciTech Connect

    Camparo, J.C.; Mackay, R.

    2006-04-24

    Stabilization of the rf power driving an inductively coupled plasma (ICP) has implications for fields ranging from atomic clocks to analytical chemistry to illumination technology. Here, we demonstrate a technique in which the plasma itself acts as a probe of radio wave power, and provides a correction signal for active rf-power control. Our technique takes advantage of the resonant nature of forced ion waves in the plasma, and their observation in the ICP's optical emission.

  15. Energy coupling to the plasma in repetitive nanosecond pulse discharges

    SciTech Connect

    Adamovich, Igor V.; Nishihara, Munetake; Choi, Inchul; Uddi, Mruthunjaya; Lempert, Walter R.

    2009-11-15

    A new analytic quasi-one-dimensional model of energy coupling to nanosecond pulse discharge plasmas in plane-to-plane geometry has been developed. The use of a one-dimensional approach is based on images of repetitively pulsed nanosecond discharge plasmas in dry air demonstrating that the plasma remains diffuse and uniform on a nanosecond time scale over a wide range of pressures. The model provides analytic expressions for the time-dependent electric field and electron density in the plasma, electric field in the sheath, sheath boundary location, and coupled pulse energy. The analytic model predictions are in very good agreement with numerical calculations. The model demonstrates that (i) the energy coupled to the plasma during an individual nanosecond discharge pulse is controlled primarily by the capacitance of the dielectric layers and by the breakdown voltage and (ii) the pulse energy coupled to the plasma during a burst of nanosecond pulses decreases as a function of the pulse number in the burst. This occurs primarily because of plasma temperature rise and resultant reduction in breakdown voltage, such that the coupled pulse energy varies approximately proportionally to the number density. Analytic expression for coupled pulse energy scaling has been incorporated into the air plasma chemistry model, validated previously by comparing with atomic oxygen number density measurements in nanosecond pulse discharges. The results of kinetic modeling using the modified air plasma chemistry model are compared with time-resolved temperature measurements in a repetitively pulsed nanosecond discharge in air, by emission spectroscopy, and purely rotational coherent anti-Stokes Raman spectroscopy showing good agreement.

  16. Energy coupling to the plasma in repetitive nanosecond pulse discharges

    NASA Astrophysics Data System (ADS)

    Adamovich, Igor V.; Nishihara, Munetake; Choi, Inchul; Uddi, Mruthunjaya; Lempert, Walter R.

    2009-11-01

    A new analytic quasi-one-dimensional model of energy coupling to nanosecond pulse discharge plasmas in plane-to-plane geometry has been developed. The use of a one-dimensional approach is based on images of repetitively pulsed nanosecond discharge plasmas in dry air demonstrating that the plasma remains diffuse and uniform on a nanosecond time scale over a wide range of pressures. The model provides analytic expressions for the time-dependent electric field and electron density in the plasma, electric field in the sheath, sheath boundary location, and coupled pulse energy. The analytic model predictions are in very good agreement with numerical calculations. The model demonstrates that (i) the energy coupled to the plasma during an individual nanosecond discharge pulse is controlled primarily by the capacitance of the dielectric layers and by the breakdown voltage and (ii) the pulse energy coupled to the plasma during a burst of nanosecond pulses decreases as a function of the pulse number in the burst. This occurs primarily because of plasma temperature rise and resultant reduction in breakdown voltage, such that the coupled pulse energy varies approximately proportionally to the number density. Analytic expression for coupled pulse energy scaling has been incorporated into the air plasma chemistry model, validated previously by comparing with atomic oxygen number density measurements in nanosecond pulse discharges. The results of kinetic modeling using the modified air plasma chemistry model are compared with time-resolved temperature measurements in a repetitively pulsed nanosecond discharge in air, by emission spectroscopy, and purely rotational coherent anti-Stokes Raman spectroscopy showing good agreement.

  17. Local fields in strongly coupled plasmas

    SciTech Connect

    Pollock, E.L.; Weisheit, J.C.

    1984-06-01

    Computer simulation techniques and important static properties of plasma microfields are discussed. The relevant timescales are introduced for dynamical atomic problems, and some time-dependent properties of microfields are discussed. In the last two sections of the paper these results are applied to two problems relevant to the spectroscopy of dense plasmas: (1) broadening of spectral lines, and (2) screening in inelastic electron-ion collisions.

  18. Relative dissociation fractions of CF4 under 15–30 keV H‑, C‑ and O‑ negative ion impact

    NASA Astrophysics Data System (ADS)

    Wang, Dedong; Fan, Yikui; Zhao, Zilong; Min, Guangxin; Zhang, Xuemei

    2016-08-01

    The relative dissociation fractions to produce the fragments of CF4 molecule are studied under the impact of 15 keV to 30 keV H‑, C‑ and O‑ negative ions. By using a time-of-flight mass spectrometer, the recoil ions and ion pairs originating from the target molecule CF4 are detected and identified in coincidence with scattered ions in q = 0 and q = +1 charge states. The fractions for the production of the fragment ions are obtained relative to the {\\text{CF} }3+ yield, while that of the ion pairs relative to the (C+, F+) coincidence yield.

  19. Magnetic field-aligned coupling effects on ionospheric plasma structure

    NASA Technical Reports Server (NTRS)

    Heelis, R. A.; Vickrey, J. F.

    1990-01-01

    This paper presents a mathematical description of the electrical coupling and dynamics of plasma structure in the E and F regions. The scale size dependence of the electric field coupling along the magnetic field is examined for a realistic background ionosphere and atmosphere. It is shown that, while normalized potentials map reciprocally between two altitudes, the potential disturbance caused by a fixed amplitude plasma density perturbation does not. The magnitude of electrostatic potential created by structured ionization is also shown to be strongly dependent on the altitude of the structure. The role of diffusion parallel to the magnetic field in the redistribution and decay of plasma structure is illustrated.

  20. PFC Abatement in Capacitevely-Coupled Plasma Reactor

    NASA Astrophysics Data System (ADS)

    Porshnev, P. I.; Alaoui, M.; Diamant, Stela; Francis, Terry; Raoux, Sebastien; Woolston, Mike

    2001-10-01

    A low-pressure plasma reactor, was developed to reduce PFC emissions of dielectric etch tools, is a point-of-use environmentally and economically sound solution. Generally, local electric fields in capacitively-coupled (CC) plasmas are higher than in inductively-coupled (IC) plasmas. As a result, electron energy distributions in CC plasmas have more pronounced high-energy part compared to the ones in IC plasmas. This is particularly important for effective breaking of the strong C-F bonds, which dissociation potentials are observably higher than the average electron energy. CC plasma in the Pegasys (Plasma Exhaust Gas Abatement SYStem) reactor was found to be in so-called g-regime, in which ionization is provided with secondary emission electrons. Though in these plasmas, the majority of electrons still reside in plasma bulk, the most important discharge characteristics, in particular, the abatement efficiency, are determined by highly-energetic electrons from sheath zones. With water being added to the incoming gas mixture, better than 95% destruction removal efficiency of the PFCs has been achieved for all dielectric etch applications. CC plasma-based abatement significantly differs from existing abatement methods, especially combustion and catalytic oxidation, which are much less environmentally friendly and economically viable.

  1. Coupling modes in a dipolar microwave plasma source

    NASA Astrophysics Data System (ADS)

    Lacoste, Ana; Baele, Pierre; Maurau, Remy; Bechu, Stephane; Bes, Alexandre

    2015-09-01

    The multi-dipolar microwave plasma is a suitable technology for the scaling-up of high density plasma processing in the very low pressure range. Effectively, a large area or volume of plasma can be achieved by a mere distribution, over 2 or 3 dimensions, of a number of elementary plasma sources. To enhance the microwave coupling efficiency and optimize the spatial repartition of the elementary plasma sources, it could be helpful to localize the production regions and coupling modes that govern the energy transfer from the wave to the electrons. The main objective of this work is to identify the possible coupling modes as a function of operating parameters. Accordingly, the plasma parameters (electron temperature, density) were correlated together with the electromagnetic radiation, as well as with different coupling modes observed as a function of microwave power. High plasma densities, up to 10 times the critical density (for one source), can be achieved through an efficient transfer of the electrostatic wave energy to the electrons.

  2. Effect of collisions on the resonance vibrational polarizability of gaseous SF6 and CF4 molecules

    NASA Astrophysics Data System (ADS)

    Bulanin, M. O.; Burtsev, A. P.; Kislyakov, I. M.; Sveshnikov, Yu. M.

    2004-09-01

    The density dependences of the absorption cross sections and refractivity are experimentally studied for the SF6 and CF4 molecules in pure gases in the region of their ν3 infrared vibrational-rotational antisymmetric modes. The dispersions of the refractive index are determined for both compounds by the Kramers-Kronig transformation of the spectral data obtained, and, for the SF6 isotopomers, they are also measured by the method of two-color interferometry. Strong nonlinear dependences of optical parameters and their dispersions on the gas density are observed. The values of second optical virial coefficient B R (ν) obtained for pure SF6 are more than an order of magnitude greater than the values found earlier for mixtures of SF6 with buffer rare gases. The results of calculations of the second virial coefficients of the absorption cross section and refractivity in terms of the DID model of interacting dipoles are in agreement with the experimental data in the band wings. Correlations between the behavior of the spectral dependence of functions B R (ν) and the parameters of model intermolecular potentials used in the calculations are found.

  3. Experimental investigation on no-vent fill process using tetrafluoromethane (CF4)

    NASA Astrophysics Data System (ADS)

    Kim, Youngcheol; Lee, Cheonkyu; Park, Jiho; Seo, Mansu; Jeong, Sangkwon

    2016-03-01

    This paper investigates the transfer of liquid cryogens using a no-vent fill (NVF) process experimentally to identify the dominant NVF parameters. The experimental apparatus has been fabricated with extensive instrumentations to precisely study the effects of each NVF parameter. Liquid tetrafluoromethane (CF4) is selected as the working fluid due to its similar molecular structures and similar normal boiling point and triple point with liquid methane which has been considered as an attractive future cryogenic propellant. The experimental results show that the initial receiver tank wall temperature and the incoming liquid temperature are the primary factors that characterize the (non-equilibrium) thermodynamic state at the start of a NVF transfer. The supply pressure is also critical as it indicates the ability to condense vapor in the receiver tank. A non-dimensional map based on energy balance is proposed to find acceptable initial conditions of the filling volume at the desired final tank pressure. The non-dimensional map shows good agreement with the NVF data not only in this paper but also in the previous research.

  4. Structural properties of lithium atom under weakly coupled plasma environment

    NASA Astrophysics Data System (ADS)

    Dutta, S.; Saha, J. K.; Chandra, R.; Mukherjee, T. K.

    2016-04-01

    The Rayleigh-Ritz variational technique with a Hylleraas basis set is being tested for the first time to estimate the structural modifications of a lithium atom embedded in a weakly coupled plasma environment. The Debye-Huckel potential is used to mimic the weakly coupled plasma environment. The wave functions for both the helium-like lithium ion and the lithium atom are expanded in the explicitly correlated Hylleraas type basis set which fully takes care of the electron-electron correlation effect. Due to the continuum lowering under plasma environment, the ionization potential of the system gradually decreases leading to the destabilization of the atom. The excited states destabilize at a lower value of the plasma density. The estimated ionization potential agrees fairly well with the few available theoretical estimates. The variation of one and two particle moments, dielectric susceptibility and magnetic shielding constant, with respect to plasma density is also been discussed in detail.

  5. Solar terrestrial coupling through space plasma processes

    SciTech Connect

    Birn, J.

    2000-12-01

    This is the final report of a three-year, Laboratory-Directed Research and Development (LDRD) project at the Los Alamos National Laboratory (LANL). The project investigates plasma processes that govern the interaction between the solar wind, charged particles ejected from the sun, and the earth's magnetosphere, the region above the ionosphere governed by the terrestrial magnetic field. Primary regions of interest are the regions where different plasma populations interact with each other. These are regions of particularly dynamic plasma behavior, associated with magnetic flux and energy transfer and dynamic energy release. The investigations concerned charged particle transport and energization, and microscopic and macroscopic instabilities in the magnetosphere and adjacent regions. The approaches combined space data analysis with theory and computer simulations.

  6. Fluid-Plasma Coupling in Hydrogen Flames

    NASA Astrophysics Data System (ADS)

    Massa, Luca; Retter, Jonathan; Glumac, Nick; Elliot, Gregg; Freund, Jonathan

    2015-11-01

    Recent experiments show that hydrogen diffusion flames at low Reynolds number can be markedly affected by a dielectric barrier discharge (DBD) plasma. The flame surface deforms and flattens, and light emissions increase. We develop a simulation model to analyze the mechanisms that causes these changes, and apply it to numerical calculations of axisymmetric flames with co-annular DBD, matching the corresponding experiments. Body forces due to charge sheaths are found to be the main mechanism, with radicals produced by plasma excitation playing a secondary role for the present conditions. The non-actuated flame flickers at approximately 10 Hz, in good agreement with the experiments. As the DBD voltage is increased, the flame flattens and oscillations decrease, eventually ceasing above a threshold value. The fully flattened case has a stoichiometric surface lying flat across the fuel orifice, with flame temperature exceeding significantly the adiabatic flame value. A force based on a linearized plasma sheath model, calibrated against air experiments, reproduces the main features of the experiments and provides a good estimate for the threshold flattening potential. In faster flowing regimes, radical production by the plasma becomes more important.

  7. Coupling of axial plasma jets to compressional Alfven waves

    NASA Astrophysics Data System (ADS)

    Vincena, Stephen; Gekelman, Walter

    2009-11-01

    The coupling of mass, energy, and momentum from a localized, dense, and rapidly expanding plasma into a large-scale magnetized background plasma is central to understanding many physical processes; these include galactic jets, coronal mass ejections, tokamak pellet fueling, high-altitude nuclear detonations, chemical releases in the ionosphere, and supernovae. The large-scale magnetized plasmas are capable of supporting Alfv'en waves, which mediate the flow of currents and associated changes of magnetic topology on the largest size scales of the external system. We present initial results from a laboratory experiment wherein a fast-moving, laser-produced plasma (LPP) is allowed to propagate along the magnetic field lines of a pre-existing plasma column (17m long by 60 cm diameter). The LPP is generated using a 1J, 8ns Nd:YAG laser fired at a graphite target. The laser is pulsed along with the background plasma at 1Hz. This work focuses on the coupling of the LPP to compressional Alfv'en waves in the background plasma. The experiments are conducted at UCLA's Basic Plasma Science Facility in the Large Plasma Device.

  8. Measured and predicted shock shapes for AFE configuration at Mach 6 in air and in CF4

    NASA Technical Reports Server (NTRS)

    Wells, William L.; Franks, Alan M.

    1988-01-01

    Shock shapes and stand-off distances were obtained for the Aeroassist Flight Experiment configuration from Mach 6 tests in air and in CF4. Results were plotted for an angle-of attack range from -10 to 10 degrees and comparisons were made at selected angles with inviscid-flow predictions. Tests were performed in the Langley Research Center (LaRC) 20 inch Mach 6 Tunnel (air) at unit free-stream Reynolds numbers (N sub Re, infinity) of 2 million/ft and 0.6 million/ft and in the LaRC Hypersonic CF4 Tunnel at N sub Re, infinity = 0.5 million/ft and 0.3 million/ft. Within the range of these tests, N sub Re, infinity did not affect the shock shape or stand off distance, and the predictions were in good agreement with the measurements. The shock stand-off distance in CF4 was approximately half of that in air. This effect resulted from the differences in density ratio across the normal shock, which was approximately 12 in CF4 and 5 in air. In both test gases, the shock lay progressively closer to the body as angle of attack decreased.

  9. Study of the dielectric breakdown properties of hot SF6-CF4 mixtures at 0.01-1.6 MPa

    NASA Astrophysics Data System (ADS)

    Li, Xingwen; Zhao, Hu; Jia, Shenli; Murphy, Anthony B.

    2013-08-01

    The dielectric breakdown properties of SF6-CF4 mixtures were investigated at different ratios of SF6, 0.01-1.6 MPa, and gas temperatures up to 3000 K. Initially, the equilibrium compositions of SF6-CF4 mixtures were calculated by minimizing the Gibbs free energy under the assumptions of local thermodynamic and chemical equilibrium. Then the electron energy distribution function was obtained based on those data by solving the Boltzmann equation under the zero-dimensional two-term spherical harmonic approximation. Finally, the critical reduced electric field strength (E/N)cr of SF6-CF4 mixtures, which is defined as the value for which total ionization reaction is equal to total attachment reaction, were determined and analyzed. The results confirm the superior breakdown properties of pure SF6 at relatively low gas temperatures. However, for higher gas temperatures (i.e., T > 2200 K at 0.4 MPa), the (E/N)cr in SF6-CF4 mixtures are obviously higher than that in pure SF6 and the values of (E/N)cr increase with the reduction of the ratio of SF6.

  10. Stopping Power for Strong Beam-Plasma Coupling

    NASA Astrophysics Data System (ADS)

    Gericke, Dirk O.

    2001-10-01

    The slowing down process of charged particles in plasma targets is investigated for the case of strong beam-plasma coupling. Strong beam-plasma correlations can be considered using the collision operator of the quantum Boltzmann equation. As a first step, dynamic screening is included in the first Born approximation. This approach gives good results for moderate beam-plasma coupling (Zb Γ^3/2 < 0.2) but fails for strong coupling. In the latter regime, one has to include dynamic screening effects also in terms beyound the first Born approximation. This can be done approximately applying a velocity dependent screening length. A comparison with other models, e.g. the Bethe-formula, the standard model of the stopping power (Bethe plus Bloch corrections and Barkas terms), the Li & Petrasso formula and simulation data (MD and PIC), is given. This comparison clearly shows the advantage of the proposed model: it smoothly interpolates between the classical low velocity regime, where strong coupling effects occur, and the high velocity quantum regime, where collective modes are important. In the latter case, the experimentally proven Bethe-formula is obtained. Furthermore, it matches the simulation data for moderate as well as strong beam-plasma coupling.

  11. Dust acoustic instability in a strongly coupled dusty plasma

    NASA Astrophysics Data System (ADS)

    Rosenberg, M.; Kalman, G. J.; Hartmann, P.; Goree, J.

    2013-10-01

    Dusty plasmas are plasmas containing charged micron to sub-micron size dust grains (solid particulates). Because the grains can be multiply charged and are much more massive than the ions, the presence of dust can lead to novel waves such as the dust acoustic wave, which is a compressional wave that can be excited by a flow of ions that is driven by an electric field. Moreover, the large dust charge can result in strong Coulomb coupling between the dust grains, where the electrostatic energy between neighboring grains is larger than their thermal (kinetic) energy. When the coupling between dust grains is strong, but not large enough for crystallization, the dust is in the strongly coupled liquid phase. This poster theoretically investigates the dust acoustic instability, which is driven by sub-thermal ion flow, in a three-dimensional dusty plasma in the strongly coupled liquid phase. It is found that strong coupling enhances the instability. The application is to microgravity experiments with dusty plasma planned for the PK-4 and PlasmaLab instruments, which are in development for the International Space Station. Microgravity conditions enable the preparation of dust clouds under these sub-thermal ion flow conditions by avoiding the need for strong electric fields to levitate the dust grains.

  12. Linear coupling of acoustic and cyclotron waves in plasma flows

    SciTech Connect

    Rogava, Andria; Gogoberidze, Grigol

    2005-05-15

    It is found that in magnetized electrostatic plasma flows the velocity shear couples ion-acoustic waves with ion-cyclotron waves and leads, under favorable conditions, to their efficient reciprocal transformations. It is shown that in a two-dimensional setup this coupling has a remarkable feature: it is governed by equations that are mathematically equal to the ones describing coupling of sound waves with internal gravity waves [Rogava and Mahajan, Phys. Rev. E 55, 1185 (1997)] in neutral fluids. For flows with low shearing rates a fully analytic, quantitative description of the coupling efficiency, based on a noteworthy quantum-mechanical analogy, is given and transformation coefficients are calculated.

  13. Linear coupling of acoustic and cyclotron waves in plasma flows

    NASA Astrophysics Data System (ADS)

    Rogava, Andria; Gogoberidze, Grigol

    2005-05-01

    It is found that in magnetized electrostatic plasma flows the velocity shear couples ion-acoustic waves with ion-cyclotron waves and leads, under favorable conditions, to their efficient reciprocal transformations. It is shown that in a two-dimensional setup this coupling has a remarkable feature: it is governed by equations that are mathematically equal to the ones describing coupling of sound waves with internal gravity waves [Rogava and Mahajan, Phys. Rev. E 55, 1185 (1997)] in neutral fluids. For flows with low shearing rates a fully analytic, quantitative description of the coupling efficiency, based on a noteworthy quantum-mechanical analogy, is given and transformation coefficients are calculated.

  14. Emissions of Tetrafluoromethane (CF4) and Hexafluoroethane (C2F6) from East Asian Aluminum and Semiconductor Industries

    NASA Astrophysics Data System (ADS)

    Kim, J.; Li, S.; Muhle, J.; Fang, X.; Manning, A. J.; Arnold, T.; Park, S.; Park, M.; Saito, T.; Yokouchi, Y.; Stohl, A.; Weiss, R. F.; Kim, K.

    2013-12-01

    Tetrafluoromethane (CF4) and Hexafluoroethane (C2F6) are among the most potent greenhouse gases (GHGs), with atmospheric lifetimes of 50,000 and 10,000 years and 100-year Global Warming Potentials of 7,490 and 12,200, respectively. The Chinese aluminum smelting (AL) industry, accounting for 39% of the global aluminum production in 2010, has become a significant emitter of these compounds to the atmosphere, . The AL industry has estimated its Chinese emissions averaged over 2008-2010 at 1.4 Gg/yr of CF4 and 0.06 Gg/yr of C2F6. In this study we combine East Asian measurements of C2F6 at Gosan (Jeju Island, Korea), Hateruma, and Ochi-Ishi (Japan) and of CF4 at Gosan, using inversion techniques and two Lagrangian particle dispersion models (FLEXPART and NAME), to estimate the emissions of these two compounds from China and East Asia. Our results yield total emissions from China for the 2008-2010 period of approximately 4 × 0.5 Gg/yr for CF4 and 0.8 × 0.1 Gg/yr for C2F6. These results may be reconciled if emissions of these compounds from China's semiconductor (SC) industry are larger than currently estimated. However, evidence presented in the analysis of the inversion results and in the C2F6/CF4 emission ratios observed for China suggest that China's AL industry emissions are likely to be the dominant source of the discrepancy between reported emissions and those inferred from atmospheric measurements. As the AL and SC industries evolve toward new manufacturing technologies that reduce GHG emissions, continued and improved atmospheric measurements and modeling in this region will be useful in assessing the effectiveness of these changes.

  15. Efficient destruction of CF4 through in situ generation of alkali metals from heated alkali halide reducing mixtures.

    PubMed

    Lee, Myung Churl; Choi, Wonyong

    2002-03-15

    Perfluorocarbons (PFCs) are the most potent green house gases that are very recalcitrant at destruction. An effective way of converting PFCs using hot solid reagents into safe products has been recently introduced. By investigating the thermal reductive destruction of tetrafluoromethane (CF4) we provided new insight and more physicochemical consideration on this novel process. The complete destruction of CF4was successfully achieved by flowing the gas through a heated reagent bed (400-950 degrees C) that contained powder mixtures of alkali halides, CaO, and Si. The silicon acted as a reducing agent of alkali halides for the in-situ production of alkali metals, and the calcium oxide played the role of a halide ion acceptor. The absence of any single component in this ternary mixture drastically reduced the destruction efficiency of CF4. The CF4 destruction efficiencies with the solid reagent containing the alkali halide, MX, increased in the order of Li approximately Na < K < Cs for alkali cations and I < Br < Cl < F for halide anions. This trend agreed with the endothermicity of the alkali metal generation reaction: the higher the endothermicity, the lower the destruction efficiency. Alkali metal generation was indirectly detected by monitoring H2 production from its reaction with water. The production of alkali metals increased with NaF, KF, and CsF in this order. The CsF/CaO/Si system exhibited the complete destruction of CF4 at as low as 600 degrees C. The solid product analysis by X-ray diffraction (XRD) showed the formation of CaF2 and the depletion of Si with black carbon particles formed in the solid reagent residue. No CO/CO2 and toxic HF and SiF4 formation were detected in the exhaust gas. PMID:11944694

  16. Effect of strongly coupled plasma on photoionization cross section

    NASA Astrophysics Data System (ADS)

    Das, Madhusmita

    2014-01-01

    The effect of strongly coupled plasma on the ground state photoionization cross section is studied. In the non relativistic dipole approximation, cross section is evaluated from bound-free transition matrix element. The bound and free state wave functions are obtained by solving the radial Schrodinger equation with appropriate plasma potential. We have used ion sphere potential (ISP) to incorporate the plasma effects in atomic structure calculation. This potential includes the effect of static plasma screening on nuclear charge as well as the effect of confinement due to the neighbouring ions. With ISP, the radial equation is solved using Shooting method approach for hydrogen like ions (Li+2, C+5, Al+12) and lithium like ions (C+3, O+5). The effect of strong screening and confinement is manifested as confinement resonances near the ionization threshold for both kinds of ions. The confinement resonances are very much dependent on the edge of the confining potential and die out as the plasma density is increased. Plasma effect also results in appearance of Cooper minimum in lithium like ions, which was not present in case of free lithium like ions. With increasing density the position of Cooper minimum shifts towards higher photoelectron energy. The same behaviour is also true for weakly coupled plasma where plasma effect is modelled by Debye-Huckel potential.

  17. Effect of strongly coupled plasma on photoionization cross section

    SciTech Connect

    Das, Madhusmita

    2014-01-15

    The effect of strongly coupled plasma on the ground state photoionization cross section is studied. In the non relativistic dipole approximation, cross section is evaluated from bound-free transition matrix element. The bound and free state wave functions are obtained by solving the radial Schrodinger equation with appropriate plasma potential. We have used ion sphere potential (ISP) to incorporate the plasma effects in atomic structure calculation. This potential includes the effect of static plasma screening on nuclear charge as well as the effect of confinement due to the neighbouring ions. With ISP, the radial equation is solved using Shooting method approach for hydrogen like ions (Li{sup +2}, C{sup +5}, Al{sup +12}) and lithium like ions (C{sup +3}, O{sup +5}). The effect of strong screening and confinement is manifested as confinement resonances near the ionization threshold for both kinds of ions. The confinement resonances are very much dependent on the edge of the confining potential and die out as the plasma density is increased. Plasma effect also results in appearance of Cooper minimum in lithium like ions, which was not present in case of free lithium like ions. With increasing density the position of Cooper minimum shifts towards higher photoelectron energy. The same behaviour is also true for weakly coupled plasma where plasma effect is modelled by Debye-Huckel potential.

  18. Component Framework for Loosely Coupled High Performance Integrated Plasma Simulations

    NASA Astrophysics Data System (ADS)

    Elwasif, W. R.; Bernholdt, D. E.; Shet, A. G.; Batchelor, D. B.; Foley, S.

    2010-11-01

    We present the design and implementation of a component-based simulation framework for the execution of coupled time-dependent plasma modeling codes. The Integrated Plasma Simulator (IPS) provides a flexible lightweight component model that streamlines the integration of stand alone codes into coupled simulations. Standalone codes are adapted to the IPS component interface specification using a thin wrapping layer implemented in the Python programming language. The framework provides services for inter-component method invocation, configuration, task, and data management, asynchronous event management, simulation monitoring, and checkpoint/restart capabilities. Services are invoked, as needed, by the computational components to coordinate the execution of different aspects of coupled simulations on Massive parallel Processing (MPP) machines. A common plasma state layer serves as the foundation for inter-component, file-based data exchange. The IPS design principles, implementation details, and execution model will be presented, along with an overview of several use cases.

  19. A new class of strongly coupled plasmas inspired by sonoluminescence

    NASA Astrophysics Data System (ADS)

    Bataller, Alexander; Plateau, Guillaume; Kappus, Brian; Putterman, Seth

    2014-10-01

    Sonoluminescence originates in a strongly coupled plasma with a near liquid density and a temperature of ~10,000 K. This plasma is in LTE and therefore, it should be a general thermodynamic state. To test the universality of sonoluminescence, similar plasma conditions were generated using femtosecond laser breakdown in high pressure gases. Calibrated streak spectroscopy reveals both transport and thermodynamic properties of a strongly coupled plasma. A blackbody spectrum, which persists long after the exciting laser has turned off, indicates the presence of a highly ionized LTE microplasma. In parallel with sonoluminescence, this thermodynamic state is achieved via a considerable reduction in the ionization potential. We gratefully acknowledge support from DARPA MTO for research on microplasmas. We thank Brian Naranjo, Keith Weninger, Carlos Camara, Gary Williams, and John Koulakis for valuable discussions.

  20. Dust acoustic waves in strongly coupled dusty plasmas

    SciTech Connect

    Rosenberg, M. Kalman, G.

    1997-12-01

    Dust grains, or solid particles of {mu}m to sub-{mu}m sizes, are observed in various low-temperature laboratory plasmas such as process plasmas and dust plasma crystals. The massive dust grains are generally highly charged, and it has been shown within the context of standard plasma theory that their presence can lead to new low-frequency modes such as dust acoustic waves. In certain laboratory plasmas, however, the dust may be strongly coupled, as characterized by the condition {Gamma}{sub d}=Q{sub d}{sup 2}exp({minus}d/{lambda}{sub D})/dT{sub d}{ge}1, where Q{sub d} is the dust charge, d is the intergrain spacing, T{sub d} is the dust thermal energy, and {lambda}{sub D} is the plasma screening length. This paper investigates the dispersion relation for dust acoustic waves in a strongly coupled dusty plasma comprised of strongly coupled negatively charged dust grains, and weakly correlated classical ions and electrons. The dust grains are assumed to interact via a (screened Coulomb) Yukawa potential. The strongly coupled gas phase (liquid phase) is considered, and a quasilocalized charge approximation scheme is used, generalized to take into account electron and/or ion screening of the dust grains. The scheme relates the small-k dispersion to the total correlation energy of the system, which is obtained from the results of published numerical simulations. Some effects of collisions of charged particles with neutrals are taken into account. Applications to laboratory dusty plasmas are discussed. {copyright} {ital 1997} {ital The American Physical Society}

  1. Equation of state of strongly coupled plasma mixtures

    SciTech Connect

    DeWitt, H.E.

    1984-02-03

    Thermodynamic properties of strongly coupled (high density) plasmas of mixtures of light elements have been obtained by Monte Carlo simulations. For an assumed uniform charge background the equation of state of ionic mixtures is a simple extension of the one-component plasma EOS. More realistic electron screening effects are treated in linear response theory and with an appropriate electron dielectric function. Results have been obtained for the ionic pair distribution functions, and for the electric microfield distribution.

  2. Probing strongly coupled anisotropic plasmas from higher curvature gravity

    NASA Astrophysics Data System (ADS)

    Jahnke, Viktor; Misobuchi, Anderson Seigo

    2016-06-01

    We consider five-dimensional AdS-axion-dilaton gravity with a Gauss-Bonnet term and use a black brane solution displaying spatial anisotropy as the gravity dual of a strongly coupled anisotropic plasma. We compute several observables relevant to the study of the plasma, namely, the drag force, the jet quenching parameter, the quarkonium potential, and the thermal photon production. The effects of higher derivative corrections and of the anisotropy are discussed and compared with previous results.

  3. Coupled Dust-Lattice Modes in Magnetized Complex Plasmas

    SciTech Connect

    Farokhi, B.; Shahmansouri, M.

    2008-09-07

    Dust lattice wave modes in a one dimensional plasma crystal (formed by paramagnetic dust particles) suspended in the plasma sheath are studied. The ion flow in the sheath introduces 'ion wakes' below the crystal particles. The wave dispersion relations are found under the influence of inhomogeneous magnetic field, wake charge effect and equilibrium charge gradient. The expression for the wave dispersion relations clearly show that three branches exist as a result of the coupling of longitudinal and transverse modes due to the Lorenz forces, charge gradient and wake charge effect. We observe a new coupling between the dust lattice modes, which have not reported so far.

  4. Helium-like magnesium embedded in strongly coupled plasma

    NASA Astrophysics Data System (ADS)

    Bhattacharyya, Sukhamoy

    2016-05-01

    In recent days, with the advent of the x-ray free electron laser (FEL) with Linac coherent light source (LCLS) and the Orion laser, experimental studies on atomic systems within strongly coupled plasma environment with remarkable improvement in accuracy as compared to earlier experiments have become possible. In these kinds of experiments, hydrogen-like and helium-like spectral lines are used for determination of plasma parameters such as temperature, density. Accurate theoretical calculations are, therefore, necessary for such kind of studies within a dense plasma environment. In this work, ab initio calculations are carried out in the framework of the Rayleigh-Ritz variation principle to estimate the ground state energy of helium-like magnesium within strongly coupled plasma environment. Explicitly correlated wave functions in Hylleraas coordinates have been used to incorporate the effect of electron correlation. The ion-sphere model potential that confines the central positive ion in a finite domain filled with plasma electrons has been adopted to mimic the strongly coupled plasma environment. Thermodynamic pressure 'felt' by the ion in the ground states due to the confinement inside the ion spheres is also estimated.

  5. Suppression of Rayleigh Taylor instability in strongly coupled plasmas

    SciTech Connect

    Das, Amita; Kaw, Predhiman

    2014-06-15

    The Rayleigh Taylor instability in a strongly coupled plasma medium has been investigated using the equations of generalized hydrodynamics. It is demonstrated that the visco-elasticity of the strongly coupled medium due to strong inter particle correlations leads to a suppression of the Rayleigh Taylor instability unless certain threshold conditions are met. The relevance of these results to experiments on laser compression of matter to high densities including those related to inertial confinement fusion using lasers has also been shown.

  6. Nonlinear Generalized Hydrodynamic Wave Equations in Strongly Coupled Dusty Plasmas

    SciTech Connect

    Veeresha, B. M.; Sen, A.; Kaw, P. K.

    2008-09-07

    A set of nonlinear equations for the study of low frequency waves in a strongly coupled dusty plasma medium is derived using the phenomenological generalized hydrodynamic (GH) model and is used to study the modulational stability of dust acoustic waves to parallel perturbations. Dust compressibility contributions arising from strong Coulomb coupling effects are found to introduce significant modifications in the threshold and range of the instability domain.

  7. Method of processing materials using an inductively coupled plasma

    DOEpatents

    Hull, D.E.; Bieniewski, T.M.

    1987-04-13

    A method of processing materials. The invention enables ultrafine, ultrapure powders to be formed from solid ingots in a gas free environment. A plasma is formed directly from an ingot which insures purity. The vaporized material is expanded through a nozzle and the resultant powder settles on a cold surface. An inductively coupled plasma may also be used to process waste chemicals. Noxious chemicals are directed through a series of plasma tubes, breaking molecular bonds and resulting in relatively harmless atomic constituents. 3 figs.

  8. Collisional coupling in counterstreaming laser-produced plasmas

    NASA Technical Reports Server (NTRS)

    Koopman, D. W.; Goforth, R. R.

    1974-01-01

    The collisional processes which transfer momentum between counterstreaming plasmas are reviewed and applied to the example of a laser-produced plasma expanding into a partially ionized background. Experimental measurements of the dependence of the ion flow field on collisional momentum transfer demonstrate the validity of the simplified treatment of collision processes which have been adopted. A numerical model which simulates the laser-plasma interaction with the background confirms the importance of collisions in previous experimental studies of momentum coupling, and provides some insight into the distinction between collisional and collisionless flow regimes.

  9. Inductively coupled plasma torch with laminar flow cooling

    DOEpatents

    Rayson, Gary D.; Shen, Yang

    1991-04-30

    An improved inductively coupled gas plasma torch. The torch includes inner and outer quartz sleeves and tubular insert snugly fitted between the sleeves. The insert includes outwardly opening longitudinal channels. Gas flowing through the channels of the insert emerges in a laminar flow along the inside surface of the outer sleeve, in the zone of plasma heating. The laminar flow cools the outer sleeve and enables the torch to operate at lower electrical power and gas consumption levels additionally, the laminar flow reduces noise levels in spectroscopic measurements of the gaseous plasma.

  10. Effect of antenna capacitance on the plasma characteristics of an internal linear inductively coupled plasma system

    NASA Astrophysics Data System (ADS)

    Lim, Jong Hyeuk; Kim, Kyong Nam; Park, Jung Kyun; Yeom, Geun Young

    2008-08-01

    This study examined the effect of the antenna capacitance of an inductively coupled plasma (ICP) source, which was varied using an internal linear antenna, on the electrical and plasma characteristics of the ICP source. The inductive coupling at a given rf current increased with decreasing antenna capacitance. This was caused by a decrease in the inner copper diameter of the antenna made from coaxial copper/quartz tubing, which resulted in a higher plasma density and lower plasma potential. By decreasing the diameter of the copper tube from 25to10mm, the plasma density of a plasma source size of 2750×2350mm2 was increased from approximately 8×1010/cm3to1.5×1011/cm3 at 15mTorr Ar and 9kW of rf power.

  11. Effect of bias application to plasma density in weakly magnetized inductively coupled plasma

    SciTech Connect

    Kim, Hyuk; Lee, Woohyun; Park, Wanjae; Whang, Ki-Woong

    2013-07-15

    Independent control of the ion flux and energy can be achieved in a dual frequency inductively coupled plasma (ICP) system. Typically, the plasma density is controlled by the high-frequency antenna radio-frequency (RF) power and the ion energy is controlled by the low-frequency bias RF power. Increasing the bias power has been known to cause a decrease in the plasma density in capacitively coupled discharge systems as well as in ICP systems. However, an applied axial magnetic field was found to sustain or increase the plasma density as bias power is increased. Measurements show higher electron temperatures but lower plasma densities are obtained in ordinary ICP systems than in magnetized ICP systems under the same neutral gas pressure and RF power levels. Explanations for the difference in the behavior of plasma density with increasing bias power are given in terms of the difference in the heating mechanism in ordinary unmagnetized and magnetized ICP systems.

  12. Model for a transformer-coupled toroidal plasma source

    SciTech Connect

    Rauf, Shahid; Balakrishna, Ajit; Chen Zhigang; Collins, Ken

    2012-01-15

    A two-dimensional fluid plasma model for a transformer-coupled toroidal plasma source is described. Ferrites are used in this device to improve the electromagnetic coupling between the primary coils carrying radio frequency (rf) current and a secondary plasma loop. Appropriate components of the Maxwell equations are solved to determine the electromagnetic fields and electron power deposition in the model. The effect of gas flow on species transport is also considered. The model is applied to 1 Torr Ar/NH{sub 3} plasma in this article. Rf electric field lines form a loop in the vacuum chamber and generate a plasma ring. Due to rapid dissociation of NH{sub 3}, NH{sub x}{sup +} ions are more prevalent near the gas inlet and Ar{sup +} ions are the dominant ions farther downstream. NH{sub 3} and its by-products rapidly dissociate into small fragments as the gas flows through the plasma. With increasing source power, NH{sub 3} dissociates more readily and NH{sub x}{sup +} ions are more tightly confined near the gas inlet. Gas flow rate significantly influences the plasma characteristics. With increasing gas flow rate, NH{sub 3} dissociation occurs farther from the gas inlet in regions with higher electron density. Consequently, more NH{sub 4}{sup +} ions are produced and dissociation by-products have higher concentrations near the outlet.

  13. Measurements and Simulations of the Energy Distributions of Ions Bombarding Radio-frequency Biased Electrodes in an Inductively Coupled Plasma Reactor

    NASA Astrophysics Data System (ADS)

    Edelberg, Erik A.; Perry, Andrew; Benjamin, Neil; Aydil, Eray S.

    1998-10-01

    A compact retarding field ion energy analyzer has been designed and built to measure the energy distribution of ions bombarding the surface of radio frequency (rf) biased electrodes in high-density plasma reactors. Specifically, the analyzer was installed in the rf biased electrostatic chuck of a high-density, transformer-coupled plasma (TCP) reactor. The effects of TCP power, rf bias power, pressure, and gas composition on the measured ion energy distributions are demonstrated through Ar, Ne, Ar/Ne, O2 and CF4/O2 discharges. To complement the experimental results, a numerical sheath model that predicts the spatio-temporal variations of the potential across the sheath in a high density plasma has been developed. The energy distribution of ions bombarding the rf biased surface is then calculated using Monte Carlo simulations of the ion trajectories. Bimodal ion energy distributions resulting from ion energy modulation in the sheath were observed and simulated. Multiple peaks in the IEDs measured in gas mixtures were identified as signatures of ions with different masses falling through the sheath. The simulations predict both the energy separation of the bimodal IEDs as well as the ratio of the peak heights as measured by the ion energy analyzer.

  14. Debye Shielding and Particle Correlations in Strongly Coupled Dusty Plasmas

    SciTech Connect

    Otani, N.; Bhattacharjee, A.

    1997-02-01

    A particle-in-cell simulation method is shown effective in modeling strongly coupled plasmas, exhibiting good energy conservation properties and good resolution of the dust-particle interaction. For coupling parameters of order unity, the simulation dust particles exhibit Debye shielding on the spatial scale of the dust Debye length. When initialized with a large coupling parameter, the dust particles do not organize themselves into a crystalline structure as expected, but instead are scattered by the presence of substantial electrostatic wave activity. Liquid-like or crystal-like correlations among the dust particles occur only when annealing is imposed. {copyright} {ital 1997} {ital The American Physical Society}

  15. Hollow cathode plasma coupling study, 1986

    NASA Technical Reports Server (NTRS)

    Wilbur, Paul J.

    1986-01-01

    The electron collection and emission characteristics of a simple hollow cathode contactor, an extended anode hollow cathode contactor supplied by JSC, and a ring cusp magnetic field contactor are presented and the effects of discharge power and argon or xenon expellant flowrate on these characteristics are examined. All of the contactors are shown to exhibit good electron emission performance over a wide range of discharge power and expellant type and flowrate. Good electron performance is shown to be more difficult to achieve. Results suggest that the extended anode and ring cusp contactors should perform satisfactorily to electron emission currents beyond 1000 mA and electron collection currents beyond 500 mA. All contactors performed better on xenon than argon. A general theory of plasma contactor operation in both the electron collection and electron emission modes, which describes the current-limiting effects of space-charge phenomena is given. This current-limiting and collecting phenomenon is shown to be a function of driving potential differences and emitting and collecting surface radius ratio for the case of a spherical geometry. Discharge power did not appear to influence the electron collection current substantially in the experiments so it is suggested in light of the model that the contactors are generally not limited by their ion production capabilities under conditions at which they were tested.

  16. Jeans self gravitational instability of strongly coupled quantum plasma

    SciTech Connect

    Sharma, Prerana; Chhajlani, R. K.

    2014-07-15

    The Jeans self-gravitational instability is studied for quantum plasma composed of weakly coupled degenerate electron fluid and non-degenerate strongly coupled ion fluid. The formulation for such system is done on the basis of two fluid theory. The dynamics of weakly coupled degenerate electron fluid is governed by inertialess momentum equation. The quantum forces associated with the quantum diffraction effects and the quantum statistical effects act on the degenerate electron fluid. The strong correlation effects of ion are embedded in generalized viscoelastic momentum equation including the viscoelasticity and shear viscosities of ion fluid. The general dispersion relation is obtained using the normal mode analysis technique for the two regimes of propagation, i.e., hydrodynamic and kinetic regimes. The Jeans condition of self-gravitational instability is also obtained for both regimes, in the hydrodynamic regime it is observed to be affected by the ion plasma oscillations and quantum parameter while in the kinetic regime in addition to ion plasma oscillations and quantum parameter, it is also affected by the ion velocity which is modified by the viscosity generated compressional effects. The Jeans critical wave number and corresponding critical mass are also obtained for strongly coupled quantum plasma for both regimes.

  17. Coupling of dust acoustic and shear mode through velocity shear in a strongly coupled dusty plasma

    SciTech Connect

    Garai, S. Janaki, M. S.; Chakrabarti, N.

    2015-07-15

    In the strongly coupled limit, the generalized hydrodynamic model shows that a dusty plasma, acquiring significant rigidity, is able to support a “shear” like mode. It is being demonstrated here that in presence of velocity shear gradient, this shear like mode gets coupled with the dust acoustic mode which is generated by the compressibility effect of the dust fluid due to the finite temperatures of the dust, electron, and ion fluids. In the local analysis, the dispersion relation shows that velocity shear gradient not only couples the two modes but is also responsible for the instabilities of that coupled mode which is confirmed by nonlocal analysis with numerical techniques.

  18. Improvement of uniformity in a weakly magnetized inductively coupled plasma

    NASA Astrophysics Data System (ADS)

    Lee, W. H.; Cheong, H. W.; Kim, J. W.; Whang, K. W.

    2015-12-01

    Magnetic fields are applied to inductively coupled plasma (ICP) to achieve high plasma densities using electromagnets. If the magnetic fields are set up such that the magnitude of magnetic flux density on the substrate decreases with both radial and axial distances from the substrate’s center (here after referred to as M-ICP-A), the plasma density increases by 237% compared with that for ICP although the non-uniformity of the plasma density for M-ICP-A (11.1%) is higher than that for ICP (10.9%). As the rate of decrease in the magnitude of magnetic flux density on the substrate increases both radially and axially, the non-uniformity in the plasma density increases further. The increase in the non-uniformity for M-ICP-A was confirmed to arise from the flute instability. To suppress the flute instability, we arranged the magnitude of magnetic flux density on the substrate to increase with increasing distance from the substrate center both radially and axially (here after referred to as M-ICP-V). In this configuration, plasma fluctuations were not observed, hence the plasma density non-uniformity was lowered to 8.1%, although the measured plasma density was higher than that for M-ICP-A. The oxide etch-rate non-uniformity in M-ICP-V (2.5%) was also lower than that for ICP (5.2%) or that for M-ICP-A (21.4%).

  19. AETHER: A simulation platform for inductively coupled plasma

    NASA Astrophysics Data System (ADS)

    Turkoz, Emre; Celik, Murat

    2015-04-01

    An in-house code is developed to simulate the inductively coupled plasma (ICP). The model comprises the fluid, electromagnetic and transformer submodels. Fluid equations are solved to evaluate the plasma flow parameters, including the plasma and neutral densities, ion and neutral velocities, electron flux, electron temperature, and electric potential. The model relies on the ambipolar approximation and offers the evaluation of plasma parameters without solving the sheath region. The electromagnetic model handles the calculation of the electric and magnetic fields using the magnetic vector potential. The transformer model captures the effect of the matching circuit utilized in laboratory experiments for RF power deposition. The continuity and momentum equations are solved using finite volume method. The energy, electric potential, and magnetic vector potential equations are solved using finite difference method. The resulting linear systems of equations are solved with iterative solvers including Jacobi and GMRES. The code is written using the C++ programming language, it works in parallel and has graphical user interface. The model is applied to study ICP characteristics of a plasma confined within a cylindrical chamber with dielectric walls for two different power deposition cases. The results obtained from the developed model are verified using the plasma module of COMSOL Multiphysics. The model is also applied to a plasma source configuration, and it is demonstrated that there is an overall increase in the plasma potential when current is extracted from ICP with a biased wall electrode.

  20. Determination of Electron Swarm Parameters in Pure CHF3 and CF4 by a Time-Resolved Method

    NASA Astrophysics Data System (ADS)

    Xiao, Dengming; Deng, Yunkun

    2013-01-01

    The density-normalized effective ionization coefficient (α - η)/N (α and η are the ionization and attachment coefficients respectively), the electron drift velocity Ve and density-normalized longitudinal diffusion coefficient NDL in trifluoromethane (CHF3) and carbon tetrafluoride (CF4) were measured using a pulsed Townsend technique over a wide E/N range. From the plots of (α - η)/N, we have derived the limiting field strength, (E/N)lim, which is valid for the analysis of insulation characteristics and applications to power equipment. Comparisons of the electron swarms parameters between CHF3 and CF4 have been performed, and the global warming potential (GWP) is also taken into account.

  1. Effective ionization coefficients, limiting electric fields, and electron energy distributions in CF3I + CF4 + Ar ternary gas mixtures

    NASA Astrophysics Data System (ADS)

    Tezcan, S. S.; Dincer, M. S.; Bektas, S.

    2016-07-01

    This paper reports on the effective ionization coefficients, limiting electric fields, electron energy distribution functions, and mean energies in ternary mixtures of (Trifluoroiodomethane) CF3I + CF4 + Ar in the E/N range of 100-700 Td employing a two-term solution of the Boltzmann equation. In the ternary mixture, CF3I component is increased while the CF4 component is reduced accordingly and the 40% Ar component is kept constant. It is seen that the electronegativity of the mixture increases with increased CF3I content and effective ionization coefficients decrease while the limiting electric field values increase. Synergism in the mixture is also evaluated in percentage using the limiting electric field values obtained. Furthermore, it is possible to control the mean electron energy in the ternary mixture by changing the content of CF3I component.

  2. Electron energy distributions in a magnetized inductively coupled plasma

    SciTech Connect

    Song, Sang-Heon E-mail: Sang-Heon.Song@us.tel.com; Yang, Yang; Kushner, Mark J.

    2014-09-15

    Optimizing and controlling electron energy distributions (EEDs) is a continuing goal in plasma materials processing as EEDs determine the rate coefficients for electron impact processes. There are many strategies to customize EEDs in low pressure inductively coupled plasmas (ICPs), for example, pulsing and choice of frequency, to produce the desired plasma properties. Recent experiments have shown that EEDs in low pressure ICPs can be manipulated through the use of static magnetic fields of sufficient magnitudes to magnetize the electrons and confine them to the electromagnetic skin depth. The EED is then a function of the local magnetic field as opposed to having non-local properties in the absence of the magnetic field. In this paper, EEDs in a magnetized inductively coupled plasma (mICP) sustained in Ar are discussed with results from a two-dimensional plasma hydrodynamics model. Results are compared with experimental measurements. We found that the character of the EED transitions from non-local to local with application of the static magnetic field. The reduction in cross-field mobility increases local electron heating in the skin depth and decreases the transport of these hot electrons to larger radii. The tail of the EED is therefore enhanced in the skin depth and depressed at large radii. Plasmas densities are non-monotonic with increasing pressure with the external magnetic field due to transitions between local and non-local kinetics.

  3. Simulation of Plasma Characteristics for Inductively Coupled Argon Plasma Using Dual-Frequency Antennas

    NASA Astrophysics Data System (ADS)

    Li, Xue-Chun; Sun, Xiao-Yan; Wang, You-Nian

    2014-10-01

    A large-area wafer size is necessary for plasma processing in the micro-electronics industry. However, it is one of the most important issues to obtain uniform plasma over a large-area substrate in addition to high-density plasmas for the plasma processing. Recently, the experimental study on the dual-frequency inductively coupled plasma (ICP) has been reported as a mean of improving the plasma uniformity over the large-area substrate. In this work, we develop a self-consistent method combined with the electromagnetic theory and fluid model to simulate the plasma characteristics for dual-frequency inductively coupled argon plasma. In the model, the ICP source consists of two planar-spiral coils. We investigate the plasma uniformity problem by adjusting the parameters of the two coils, such as the RF current, the position of the coils and the RF frequency ratio. It was found that the uniformity of the ion density over the wafer is improved with dual-frequency antennas comparing with a single-frequency antenna. The plasma uniformity increases when the coils are located farther from the centre of the ICP source. It is consistent with the experimental study. This work was supported by the National Natural Science Foundation of China (No. 11175034, No. 11075029).

  4. Collective dynamics in strongly coupled dusty plasma medium

    NASA Astrophysics Data System (ADS)

    Das, Amita; Dharodi, Vikram; Tiwari, Sanat; Tiwari

    2014-12-01

    A simplified description of dynamical response of strongly coupled medium is desirable in many contexts of physics. The dusty plasma medium can play an important role in this regard due to its uniqueness, as its dynamical response typically falls within the perceptible grasp of human senses. Furthermore, even at room temperature and normal densities it can be easily prepared to be in a strongly coupled regime. A simplified phenomenological fluid model based on the visco - elastic behaviour of the medium is often invoked to represent the collective dynamical response of a strongly coupled dusty plasma medium. The manuscript reviews the role of this particular Generalized Hydrodynamic (GHD) fluid model in capturing the collective properties exhibited by the medium. In addition the paper also provides new insights on the collective behaviour predicted by the model for the medium, in terms of coherent structures, instabilities, transport and mixing properties.

  5. Use of a pulse-periodic optically pumped CF4 laser for photofragmentation of UF6 molecules

    NASA Astrophysics Data System (ADS)

    Kolesnikov, Yurij A.; Kotov, A. A.; Novikov, Victor P.

    1998-05-01

    Investigations of fragmentation of uranium hexafluoride molecules in radiation field of the optically pumped CF4 laser are carried out. The optical pumping was made by the pulse-periodic TEA CO2 laser. The optical cell of the CF4 laser was cooled by nitrogen vapor with automatic stabilization of the temperature. The maximum radiation energy carried by a single CF4 laser pulse is 250 mJ and the average power at a pulse repetition frequency of 50 Hz is up to 6 W. It was found that besides the direct fragmentation of UF6 molecules, the bimolecular V-V exchange realizes most probably at collision of highly excited molecules, consequently the vibronic energy of one of the molecules can exceed the dissociation threshold. Increase by an order of the UF6 molecules photofragmentation efficiency at presence of hydrogen can be explained by high chemical activation because of reverse electron relaxation of highly vibronic excited UF6 molecules. There is also ascertained that polymerization of UF5 radicals appears to be the most high-speed of al secondary reactions. In the main part the polymers ar found on the cell surface having number of the radicals in range from 2 to approximately 10.

  6. Relations for the thermodynamic and transport properties in the testing environment of the Langley hypersonic CF4 tunnel

    NASA Astrophysics Data System (ADS)

    Sutton, K.

    1981-10-01

    Thermodynamic and transport properties of gaseous CF4 that can be used in flow field computer codes and theoretical analyses for comparison of results with experimental data from the Langley Hypersonic CF4 Tunnel are presented. The thermodynamic relations which are based on thermally perfect but calorifically imperfect gas are adequate for the testing environment of the CF4 tunnel and are simpler to use than the imperfect gas relations required to define the complete expansion from the tunnel reservoir. Relations for the transport properties are based on the kinetic theory of gases in which published experimental data are used in the derivation of the relations. Extensive experimental data were located for viscosity and the derived relation should provide values for viscosity with errors of less than 1 percent. The experimental data for thermal conductivity were limited with significant disagreement between the various sources. The derived relation will probably provide values for the thermal conductivity with errors of no more than 5 percent which is within the accuracy of the experimental data.

  7. Relations for the thermodynamic and transport properties in the testing environment of the Langley hypersonic CF4 tunnel

    NASA Technical Reports Server (NTRS)

    Sutton, K.

    1981-01-01

    Thermodynamic and transport properties of gaseous CF4 that can be used in flow field computer codes and theoretical analyses for comparison of results with experimental data from the Langley Hypersonic CF4 Tunnel are presented. The thermodynamic relations which are based on thermally perfect but calorifically imperfect gas are adequate for the testing environment of the CF4 tunnel and are simpler to use than the imperfect gas relations required to define the complete expansion from the tunnel reservoir. Relations for the transport properties are based on the kinetic theory of gases in which published experimental data are used in the derivation of the relations. Extensive experimental data were located for viscosity and the derived relation should provide values for viscosity with errors of less than 1 percent. The experimental data for thermal conductivity were limited with significant disagreement between the various sources. The derived relation will probably provide values for the thermal conductivity with errors of no more than 5 percent which is within the accuracy of the experimental data.

  8. Decomposition of Potent Greenhouse Gases SF6, CF4 and SF5CF3 by Dielectric Barrier Discharge

    NASA Astrophysics Data System (ADS)

    Zhang, Renxi; Wang, Jingting; Cao, Xu; Hou, Huiqi

    2016-04-01

    For their distinguished global warming potential (GWP100) and long atmosphere lifespan, CF4, SF6 and SF5CF3 were significant in the field of greenhouse gas research. The details of discharging character and the optimal parameter were discussed by using a Dielectric Barrier Discharge (DBD) reactor to decompose these potent greenhouse gases in this work. The results showed that SF6 could be decomposed by 92% under the conditions of 5 min resident time and 3000 V applied voltage with the partial pressure of 2.0 kPa, 28.2 kPa, and 1.8 kPa for SF6, air and water vapor, respectively. 0.4 kPa CF4 could be decomposed by 98.2% for 4 min resident time with 30 kPa Ar added. The decomposition of SF5CF3 was much more effective than that of SF6 and CF4 and moreover, 1.3 kPa SF5CF3, discharged with 30 kPa O2, Ar and air, could not be detected when the resident time was 80 s, 40 s, and 120 s, respectively. All the results indicated that DBD was a feasible technique for the abatement of potent greenhouse gases. supported by National Natural Science Foundation of China (Nos. 20507004, 21577023)

  9. Three-wave coupling in electron-positron-ion plasmas

    SciTech Connect

    Tinakiche, N.; Annou, R.; Tripathi, V. K.

    2012-07-15

    The three-wave coupling processes in electron-positron-ion plasmas are investigated. The non-linear dispersion relation is derived along with the non-linear growth rate in both resonant and non resonant processes. It is shown that the inclusion of positron affects the dielectric properties of the plasma as well as the nonlinear growth rates of parametric processes. As one increases the positron density to electron density ratio from 0 to 1, maintaining quasi neutrality of the plasma, the growth rates of stimulated Raman, Brillouin, and Compton scattering processes in an isothermal plasma tend to zero due to the ponderomotive forces acting on electrons and positrons due the pump and scattered waves being equal.

  10. Energy exchange in strongly coupled plasmas with electron drift

    SciTech Connect

    Akbari-Moghanjoughi, M.; Ghorbanalilu, M.

    2015-11-15

    In this paper, the generalized viscoelastic collisional quantum hydrodynamic model is employed in order to investigate the linear dielectric response of a quantum plasma in the presence of strong electron-beam plasma interactions. The generalized Chandrasekhar's relativistic degeneracy pressure together with the electron-exchange and Coulomb interaction effects are taken into account in order to extend current research to a wide range of plasma number density relevant to big planetary cores and astrophysical compact objects. The previously calculated shear viscosity and the electron-ion collision frequencies are used for strongly coupled ion fluid. The effect of the electron-beam velocity on complex linear dielectric function is found to be profound. This effect is clearly interpreted in terms of the wave-particle interactions and their energy-exchange according to the sign of the imaginary dielectric function, which is closely related to the wave attenuation coefficient in plasmas. Such kinetic effect is also shown to be in close connection with the stopping power of a charged-particle beam in a quantum plasma. The effect of many independent plasma parameters, such as the ion charge-state, electron beam-velocity, and relativistic degeneracy, is shown to be significant on the growing/damping of plasma instability or energy loss/gain of the electron-beam.

  11. Energy exchange in strongly coupled plasmas with electron drift

    NASA Astrophysics Data System (ADS)

    Akbari-Moghanjoughi, M.; Ghorbanalilu, M.

    2015-11-01

    In this paper, the generalized viscoelastic collisional quantum hydrodynamic model is employed in order to investigate the linear dielectric response of a quantum plasma in the presence of strong electron-beam plasma interactions. The generalized Chandrasekhar's relativistic degeneracy pressure together with the electron-exchange and Coulomb interaction effects are taken into account in order to extend current research to a wide range of plasma number density relevant to big planetary cores and astrophysical compact objects. The previously calculated shear viscosity and the electron-ion collision frequencies are used for strongly coupled ion fluid. The effect of the electron-beam velocity on complex linear dielectric function is found to be profound. This effect is clearly interpreted in terms of the wave-particle interactions and their energy-exchange according to the sign of the imaginary dielectric function, which is closely related to the wave attenuation coefficient in plasmas. Such kinetic effect is also shown to be in close connection with the stopping power of a charged-particle beam in a quantum plasma. The effect of many independent plasma parameters, such as the ion charge-state, electron beam-velocity, and relativistic degeneracy, is shown to be significant on the growing/damping of plasma instability or energy loss/gain of the electron-beam.

  12. Collision-less Coupling between Explosive Debris Plasma and Magnetized Ambient Plasma

    NASA Astrophysics Data System (ADS)

    Bondarenko, Anton Sergeivich

    The explosive expansion of a dense debris plasma cloud into relatively tenuous, magnetized, ambient plasma characterizes a wide variety of astrophysical and space environments, including supernova remnants, interplanetary coronal mass ejections, and ionospheric explosions. In these and other related phenomena, collision-less electro-magnetic processes rather than Coulomb collisions typically mediate the transfer of momentum and energy from the debris plasma to the ambient plasma. In an effort to better understand the detailed physics of collision-less coupling mechanisms, compliment in situ measurements, and provide validation of previous computational and theoretical work, the present research utilizes a unique experimental platform at the University of California, Los Angeles (UCLA) to study the interaction of explosive debris plasma with magnetized ambient plasma in a reproducible laboratory setting. Specifically, by jointly employing the Large Plasma Device (LAPD) and the Phoenix laser facility, the super-Alfvenic, quasi-perpendicular expansion of laser-produced carbon (C) and hydrogen (H) debris plasma through preformed, magnetized helium (He) ambient plasma is investigated via a variety of sophisticated diagnostics, including emission spectroscopy, wavelength-filtered imaging, a magnetic flux probe, and a Langmuir probe. The key result is the direct observation of collision-less coupling via large Doppler shifts in a He II ion spectral line, which indicate that the ambient ions accelerate in response to the explosive debris plasma. Specifically, the He II ions accelerate along a trajectory that qualitatively corresponds to the large-scale laminar electric field generated by the debris expansion. A custom computational approach is utilized to simulate the initial He II ion response to the explosive debris plasma, and a synthetic Doppler-shifted wavelength spectrum constructed from the simulated ion velocities excellently reproduces the experimental

  13. Characteristics of Plasma Using a Ferromagnetic Enhanced Inductively Coupled Plasma Source

    NASA Astrophysics Data System (ADS)

    Kim, Kyong Nam; Hyeuk Lim, Jong; Park, Jung Kyun; Lim, Jong Tae; Yeom, Geun Young

    2008-09-01

    Plasma characteristics and electrical parameters of an internal linear inductively coupled plasma (ICP) source with a U-type antenna with/without a Ni-Zn ferromagnetic material installed near the antenna were investigated. The application of the ferromagnetic material to the antenna increased the plasma density, improved the plasma uniformity, lowered the antenna voltage, and increased the stability of the plasma during the operation. For the U-type ferromagnetic enhanced internal linear ICP source, a high density plasma on the order of 4.5×1011 cm-3 which is about three higher than that obtained for the source without the ferromagnetic material could be obtained at the pressure of 10 mTorr Ar and at the RF power of 600 W at 13.56 MHz.

  14. Thin film coating process using an inductively coupled plasma

    DOEpatents

    Kniseley, Richard N.; Schmidt, Frederick A.; Merkle, Brian D.

    1990-01-30

    Thin coatings of normally solid materials are applied to target substrates using an inductively coupled plasma. Particles of the coating material are vaporized by plasma heating, and pass through an orifice to a first vacuum zone in which the particles are accelerated to a velocity greater than Mach 1. The shock wave generated in the first vacuum zone is intercepted by the tip of a skimmer cone that provides a second orifice. The particles pass through the second orifice into a second zone maintained at a higher vacuum and impinge on the target to form the coating. Ultrapure coatings can be formed.

  15. CAPILLARY ELECTROPHORESIS COUPLED ON-LINE WITH INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY FOR ELEMENTAL SPECIATION

    EPA Science Inventory

    A novel interface to connect a capillary electrophoresis (CE) system with an inductively coupled plasma mass spectrometric (ICPMS) detector is reported here. The interface was built using a direct injection nebulizer (DIN) system. In this interface, the CE capillary was placed co...

  16. Spectroscopic Measurements of Collision-less Coupling Between Explosive Debris Plasmas and Ambient, Magnetized Background Plasmas

    NASA Astrophysics Data System (ADS)

    Bondarenko, Anton; Schaeffer, Derek; Everson, Erik; Vincena, Stephen; van Compernolle, Bart; Constantin, Carmen; Clark, Eric; Niemann, Christoph

    2013-10-01

    Emission spectroscopy is currently being utilized in order to assess collision-less momentum and energy coupling between explosive debris plasmas and ambient, magnetized background plasmas of astrophysical relevance. In recent campaigns on the Large Plasma Device (LAPD) (nelec =1012 -1013 cm-3, Telec ~ 5 eV, B0 = 200 - 400 G) utilizing the new Raptor laser facility (1053 nm, 100 J per pulse, 25 ns FWHM), laser-ablated carbon debris plasmas were generated within ambient, magnetized helium background plasmas and prominent spectral lines of carbon and helium ions were studied in high spectral (0 . 01 nm) and temporal (50 ns) resolution. Time-resolved velocity components extracted from Doppler shift measurements of the C+4 227 . 1 nm spectral line along two perpendicular axes reveal significant deceleration as the ions stream and gyrate within the helium background plasma, indicating collision-less momentum coupling. The He+1 320 . 3 nm and 468 . 6 nm spectral lines of the helium background plasma are observed to broaden and intensify in response to the carbon debris plasma, indicative of strong electric fields (Stark broadening) and energetic electrons. The experimental results are compared to 2D hybrid code simulations.

  17. Study on spatial distribution of plasma parameters in a magnetized inductively coupled plasma

    SciTech Connect

    Cheong, Hee-Woon; Lee, Woohyun; Kim, Ji-Won; Whang, Ki-Woong; Kim, Hyuk; Park, Wanjae

    2015-07-15

    Spatial distributions of various plasma parameters such as plasma density, electron temperature, and radical density in an inductively coupled plasma (ICP) and a magnetized inductively coupled plasma (M-ICP) were investigated and compared. Electron temperature in between the rf window and the substrate holder of M-ICP was higher than that of ICP, whereas the one just above the substrate holder of M-ICP was similar to that of ICP when a weak (<8 G) magnetic field was employed. As a result, radical densities in M-ICP were higher than those in ICP and the etch rate of oxide in M-ICP was faster than that in ICP without severe electron charging in 90 nm high aspect ratio contact hole etch.

  18. Shear waves in an inhomogeneous strongly coupled dusty plasma

    SciTech Connect

    Janaki, M. S.; Banerjee, D.; Chakrabarti, N.

    2011-09-15

    The properties of electrostatic transverse shear waves propagating in a strongly coupled dusty plasma with an equilibrium density gradient are examined using the generalized hydrodynamic (GH) equation. In the usual kinetic limit, the resulting equation has similarity to zero energy Schrodinger's equation. This has helped in obtaining some exact eigenmode solutions in both Cartesian and cylindrical geometries for certain nontrivial density profiles. The corresponding velocity profiles and the discrete eigenfrequencies are obtained for several interesting situations and their physics discussed.

  19. Line-type inductively coupled plasma source with ferromagnetic module

    NASA Astrophysics Data System (ADS)

    Hyeuk Lim, Jong; Kim, Kyong Nam; Gweon, Gwang Ho; Yeom, Geun Young

    2009-01-01

    The characteristics of a line-type, internal antenna for an inductively coupled plasma (ICP) source installed with a ferromagnetic module were investigated for possible application to roll-to-roll processing of next-generation display devices. The use of 2 MHz instead of 13.56 MHz for the 2300 mm long ICP source improved the plasma uniformity to less than 11% along the antenna line. In addition, the use of Ni-Zn ferromagnetic material in the line-type antenna improved the plasma density to about 3.1 × 1011 cm-3 at 3500 W of 2 MHz radio frequency power by confining the induced, time-varying magnetic field between the antenna line and the substrate. When the photoresist-covered glass substrate was etched at 4000 W using 40 mTorr and Ar/O2 (7 : 3), an etch uniformity of about 5-6% was obtained along the antenna line.

  20. Trace elements in seminal plasma of men from infertile couples

    PubMed Central

    Szynkowska, Małgorzata I.; Motak-Pochrzęst, Hanna; Pawlaczyk, Aleksandra; Sypniewski, Stanisław

    2015-01-01

    Introduction An analysis of lead, zinc, cadmium and other trace elements in semen of men from infertile couples was performed to determine the association between abnormal semen parameters and enviromental or occupational exposure to some trace metals. Material and methods Presence of manganese, cobalt, nickel, copper, zinc, molybdenum, cadmium, tin and lead was measured in seminal plasma of 34 men from infertile couples using spectrometry with time-of-flight analysis. Correlations among sperm parameters and trace metals were determined using cluster analysis and Pearson's correlation coefficient. Results Abnormally high concentrations of lead, cadmium, zinc and cobalt were found in 23 seminal plasma of men from infertile couples. The most consistent evidence was determined for an association between high cadmium concentration in seminal plasma and sperm count, motility and morphology below reference limits (p < 0.01). A correlation of significantly increased tin level and reduced sperm count in semen of men with limited fertility potential was observed (p = 0.04). Conclusions In our study we observed a correlation of tin level with sperm count in semen of men with limited fertility potential. PMID:26170853

  1. Mechanism for Plasma Etching of Shallow Trench Isolation Features in an Inductively Coupled Plasma

    NASA Astrophysics Data System (ADS)

    Agarwal, Ankur; Rauf, Shahid; He, Jim; Choi, Jinhan; Collins, Ken

    2011-10-01

    Plasma etching for microelectronics fabrication is facing extreme challenges as processes are developed for advanced technological nodes. As device sizes shrink, control of shallow trench isolation (STI) features become more important in both logic and memory devices. Halogen-based inductively coupled plasmas in a pressure range of 20-60 mTorr are typically used to etch STI features. The need for improved performance and shorter development cycles are placing greater emphasis on understanding the underlying mechanisms to meet process specifications. In this work, a surface mechanism for STI etch process will be discussed that couples a fundamental plasma model to experimental etch process measurements. This model utilizes ion/neutral fluxes and energy distributions calculated using the Hybrid Plasma Equipment Model. Experiments are for blanket Si wafers in a Cl2/HBr/O2/N2 plasma over a range of pressures, bias powers, and flow rates of feedstock gases. We found that kinetic treatment of electron transport was critical to achieve good agreement with experiments. The calibrated plasma model is then coupled to a string-based feature scale model to quantify the effect of varying process parameters on the etch profile. We found that the operating parameters strongly influence critical dimensions but have only a subtle impact on the etch depths.

  2. Numerical Experiments In Strongly Coupled Complex (Dusty) Plasmas

    NASA Astrophysics Data System (ADS)

    Hou, L. J.; Ivlev A.; Hubertus M. T.; Morfill, G. E.

    2010-07-01

    Complex (dusty) plasma is a suspension of micron-sized charged dust particles in a weakly ionized plasma with electrons, ions, and neutral atoms or molecules. Therein, dust particles acquire a few thousand electron charges by absorbing surrounding electrons and ions, and consequently interact with each other via a dynamically screened Coulomb potential while undergoing Brownian motion due primarily to frequent collisions with the neutral molecules. When the interaction potential energy between charged dust particles significantly exceeds their kinetic energy, they become strongly coupled and can form ordered structures comprising liquid and solid states. Since the motion of charged dust particles in complex (dusty) plasmas can be directly observed in real time by using a video camera, such systems have been generally regarded as a promising model system to study many phenomena occurring in solids, liquids and other strongly-coupled systems at the kinetic level, such as phase transitions, transport processes, and collective dynamics. Complex plasma physics has now grown into a mature research field with a very broad range of interdisciplinary facets. In addition to usual experimental and theoretical study, computer simulation in complex plasma plays an important role in bridging experimental observations and theories and in understanding many interesting phenomena observed in laboratory. The present talk will focus on a class of computer simulations that are usually non-equilibrium ones with external perturbation and that mimic the real complex plasma experiments (i. e., numerical experiment). The simulation method, i. e., the so-called Brownian Dynamics methods, will be firstly reviewed and then examples, such as simulations of heat transfer and shock wave propagation, will be present.

  3. A study on plasma parameters in various mixed Ar/SF6 inductively coupled plasma

    NASA Astrophysics Data System (ADS)

    Oh, Seung-Ju; Lee, Hyo-Chang; Chung, Chin-Wook

    2011-10-01

    SF6 gas or Ar/SF6 mixing gas is widely used in plasma processes. However, there are a little experimental study with various external parameters such as gas pressures and mixing ratios. In this work, a study of the plasma parameters was done in Ar/SF6 inductively coupled plasma (ICP) from a careful measurement of the electron energy distribution function (EEDF). The measured plasma parameters are compared to the theoretical results with simplified global model. At a low gas pressure, as mixing ratio of SF6 gas increased at a fixed ICP power, electron density decreased and electron temperature increased, but they were not changed largely. However, a remarkable increase in the electron temperature was observed with decrease in the electron density at higher gas pressures. These changes in the plasma parameters could be explained by large electron losses due to the electron attachment and the experimental results were in agreement with the theoretical results.

  4. Control of plasma density distribution via wireless power transfer in an inductively coupled plasma

    NASA Astrophysics Data System (ADS)

    Lee, Hee-Jin; Lee, Hyo-Chang; Kim, Young-Cheol; Chung, Chin-Wook

    2013-06-01

    With an enlargement of the wafer size, development of large-area plasma sources and control of plasma density distribution are required. To control the spatial distribution of the plasma density, wireless power transfer is applied to an inductively coupled plasma for the first time. An inner powered antenna and an outer resonant coil connected to a variable capacitor are placed on the top of the chamber. As the self-resonance frequency ωr of the resonant coil is adjusted, the power transfer rate from the inner powered coil to the outer resonant coil is changed and the dramatic evolution of the plasma density profile is measured. As ωr of the outer resonant coil changes from the non-resonant condition (where ωr is not the driving angular frequency ωrf) to the resonant condition (where ωr = ωrf), the plasma density profile evolves from a convex shape with maximal plasma density at the radial center into a concave shape with maximal plasma density in the vicinity of the resonant antenna coil. This result shows that the plasma density distribution can be successfully controlled via wireless resonance power transfer.

  5. Kinetic Effects in Low Pressure Capacitively Coupled Plasmas

    NASA Astrophysics Data System (ADS)

    Likhanskii, Alexandre; Roark, Christine; Stoltz, Peter

    2011-10-01

    We present results of particle-in-cell/Monte Carlo collision simulations of kinetic effects in low pressure capacitively coupled plasma discharge. In particular, we examine discharges of various gases (including Ar, Xe, and others) in the pressure range of 10s of mT and the frequency range of 10s of MHz. We track the formation of high energy electrons (e.g., at the ionization threshold or greater) as a marker for enhanced ionization, and look at the effects of elastic and inelastic collisions on the formation of these high energy electron bunches. We show results for 2D and 3D simulations where we include density gradient effects, and results for plasma chemistry effects on the bulk electron energy distribution function and the ion energy distribution function at a plasma surface interface. We discuss the role of the bunches on electron heating in the plasma bulk and on their presence on how electron heating is treated in fluid simulations of plasma sources.

  6. A Generalized Hydrodynamics Model for Strongly Coupled Plasmas

    NASA Astrophysics Data System (ADS)

    Diaw, Abdourahmane; Murillo, Michael Sean

    2015-11-01

    Starting with the equations of the Bogoliubov-Born-Green-Kirkwood-Yvon hierarchy, we obtain the density, momentum and stress tensor-moment equations. The closure proceeds in two steps. The first that guarantees an equilibrium state is given by density functional theory. It ensures self consistency in the equation-of-state properties of the plasma. The second involves modifying the two-body distribution function to include collisions in the relaxation of the stress tensor. The resulting generalized hydrodynamics thus includes all impacts of Coulomb coupling, viscous damping, and the high-frequency response. We compare our results with those of several known models, including generalized hydrodynamic theory and models obtained using the Singwi-Tosi-Land-Sjolander approximation and the quasi-localized charge approximation. We find that the viscoelastic response, including both the high-frequency elastic generalization and viscous wave damping, is important for correctly describing ion-acoustic waves. We illustrate this result by considering three very different systems: ultracold plasmas, dusty plasmas, and dense plasmas. The new model is validated by comparing its results with those obtained from molecular-dynamics simulations of Yukawa plasmas, and the agreement is excellent. This work was supported by the Air Force Office of Scientific Research (Grant No. FA9550-12-1-0344).

  7. The Importance of Optical Pathlength Control for Plasma Absorption Measurements

    NASA Technical Reports Server (NTRS)

    Cruden, Brett A.; Rao, M. V. V. S.; Sharma, Surendra P.; Meyyappan, M.; Partridge, Harry (Technical Monitor)

    2001-01-01

    An inductively coupled GEC Cell with modified viewing ports has been used to measure in-situ absorption in CF4 plasmas via Fourier Transform Infrared Spectroscopy, and the results compared to those obtained in a standard viewport configuration. The viewing ports were modified so that the window boundary is inside, rather than outside, of the GEC cell. Because the absorption obtained is a spatially integrated absorption, measurements made represent an averaging of absorbing species inside and outside of the plasma. This modification is made to reduce this spatial averaging and thus allow a more accurate estimation of neutral species concentrations and temperatures within the plasmas. By reducing this pathlength, we find that the apparent CF4 consumption increases from 65% to 95% and the apparent vibrational temperature of CF4 rises by 50-75 K. The apparent fraction of etch product SiF4 decreases from 4% to 2%. The data suggests that these density changes may be due to significant temperature gradients between the plasma and chamber viewports.

  8. Space- and Time-dependent electron velocity distribution in VHF-CCP in CF4/Ar

    NASA Astrophysics Data System (ADS)

    Yagisawa, Takashi; Makabe, Toshiaki

    2009-10-01

    The electron velocity distribution (EVD) is fundamentally important for all aspects in plasma electronics. EVD given as a solution of the Boltzmann equation provides the swarm parameter as functions of external E/N and B/N utilized for a plasma simulation. Two-term expansion was traditionally employed for solving the Boltzmann equation. This method, however, cannot give EVD in a large E/N appearing in the ion sheath region in front of a wall surface. Particle simulation (PIC/MC) was also used to estimate EVD, but heavy computational load prohibits the sample of a large number of particles in order to eliminate the statistical fluctuation. A solution of the Boltzmann equation in phase space (velocity, position-space, and time) intrinsically involves numerical diffusion resulting from the differenciation of the advection terms. In this study, we develop the numerical procedure for predicting space- and time-dependent EVD. That is, the Boltzmann equation is solved in velocity space by using our direct numerical procedure (DNP) under the presence of 2D-t electric field distribution in VHF-CCP, calculated by the RCT model. Nonlinear behavior of EVD in the bulk plasma during one cycle of VHF (100 MHz) is discussed depending on the collisional relaxation time for energy and momentum of electrons. Also, we will investigate the temporal change of EVD in the sheath region under a large E/N.

  9. Voltage distribution over capacitively coupled plasma electrode for atmospheric-pressure plasma generation

    PubMed Central

    2013-01-01

    When capacitively coupled plasma (CCP) is used to generate large-area plasma, the standing wave effect becomes significant, which results in the hindering of the uniform plasma process such as in a plasma etcher or plasma chemical vapor deposition. In this study, the transmission line modeling method is applied to calculate the voltage distribution over atmospheric-pressure CCP electrodes with the size of 1 m × 0.2 m. The measured plasma impedance in our previous study was used in the present calculation. The results of the calculations clearly showed the effects of excitation frequency and the impedance of the plasma on the form of the voltage distribution caused by the standing wave effect. In the case of 150 MHz frequency, the standing wave effect causes a drastic change in the voltage distribution via plasma ignition; however, the change is small for 13.56 MHz. It was also clarified that the power application position is important for obtaining a uniform voltage distribution. PMID:23634893

  10. Plasma Characteristics Using Superimposed Dual Frequency Inductively Coupled Plasma Source for Next Generation Device Processing.

    PubMed

    Lee, Seung Min; Lee, Chul Hee; Kim, Tae Hyung; Yeom, Geun Young; Kim, Kyong Nam

    2015-11-01

    U-shaped inductively coupled plasma (ICP) source was investigated as a linear plasma source for the next generation roll-to-toll flexible display processing. For the radio frequency power to the source, the dual frequency composed of 13.56 MHz and 2 MHz was used and the effect of dual frequency to the U-shaped ICP source on the plasma density, electron temperature, and plasma uniformity was investigated. As the operating condition, 200 mTorr Ar was used without operating turbo pumps. The use of superimposed dual frequency composed of 13.56 MHz + 2 MHz instead the single frequency of 13.56 MHz increased the plasma density slightly at the same total power. In addition, the addition of 2 MHz rf power to 0.4 kW while maintaining 1 kW 13.56 MHz rf power not only decreased electron temperature but also improved both the plasma uniformity and the process uniformity measured by photoresist etching. Therefore, by using the dual frequency to the U-shaped ICP source, not only the plasma density but also plasma uniformity could be improved in addition to the decrease of possible damage to the substrate. PMID:26726573

  11. Quasilocalized charge approximation in strongly coupled plasma physics

    SciTech Connect

    Golden, Kenneth I.; Kalman, Gabor J.

    2000-01-01

    The quasilocalized charge approximation (QLCA) was proposed in 1990 [G. Kalman and K. I. Golden, Phys. Rev. A 41, 5516 (1990)] as a formalism for the analysis of the dielectric response tensor and collective mode dispersion in strongly coupled Coulomb liquids. The approach is based on a microscopic model in which the charges are quasilocalized on a short-time scale in local potential fluctuations. The authors review the application of the QLC approach to a variety of systems which can exhibit strongly coupled plasma behavior: (i) the one-component plasma (OCP) model in three dimensions (e.g., laser-cooled trapped ions) and (ii) in two dimensions (e.g., classical 2D electron liquid trapped above the free surface of liquid helium), (iii) binary ionic mixture in a neutralizing uniform background (e.g., carbon-oxygen white dwarf interiors), (iv) charged particle bilayers (e.g., semiconductor electronic bilayers), and (v) charged particles in polarizable background (e.g., laboratory dusty plasmas). (c) 2000 American Institute of Physics.

  12. Negative ion density in inductively coupled chlorine plasmas

    SciTech Connect

    Hebner, G.A.

    1995-12-31

    The negative ion density in radio-frequency (rf) inductively-coupled chlorine discharges has been inferred using laser photodetachment spectroscopy. A Gaseous Electronics Conference (GEC) rf Reference Cell with an inductively coupled plasma source was used to produce the plasma. For this experiment, the chlorine pressure was between 20 and 50 mTorr and the rf power into the plasma was 150 to 250 Watts at 13.56 MHz. Light from a frequency quadrupled Nd:YAG laser (266 nm) was used to photodetach electrons from Cl{sup {minus}}. The time dependent excess electron density was then detected by a microwave interferometer operating at 80 GHz. Based upon the cross section for photodetachment and the measurement geometry, negative ion densities can be calculated. The inferred negative ion densities are at least an order of magnitude higher than the steady state electron density over the parameter space investigated. The dependence of the negative ion density on rf power, gas pressure, flow rate and rf phase will be discussed.

  13. Diagnostics for transport phenomena in strongly coupled dusty plasmas

    NASA Astrophysics Data System (ADS)

    Goree, J.; Liu, Bin; Feng, Yan

    2013-12-01

    Experimental methods are described for determining transport coefficients in a strongly coupled dusty plasma. A dusty plasma is a mixture of electrons, ions and highly charged microspheres. Due to their large charges, the microspheres are a strongly coupled plasma, and they arrange themselves like atoms in a crystal or liquid. Using a video microscopy diagnostic, with laser illumination and a high speed video camera, the microspheres are imaged. Moment-method image analysis then yields the microspheres' positions and velocities. In one approach, these data in the particle paradigm are converted into the continuum paradigm by binning, yielding hydrodynamic quantities like number density, flow velocity and temperature that are recorded on a grid. To analyze continuum data for two-dimensional laboratory experiments, they are fit to the hydrodynamic equations, yielding the transport coefficients for shear viscosity and thermal conductivity. In another approach, the original particle data can be used to obtain the diffusion and viscosity coefficients, as is discussed in the context of future three-dimensional microgravity experiments.

  14. Turbulence in strongly coupled dusty plasmas using generalized hydrodynamic description

    SciTech Connect

    Tiwari, Sanat Kumar; Dharodi, Vikram Singh; Das, Amita; Patel, Bhavesh G.; Kaw, Predhiman

    2015-02-15

    The properties of decaying turbulence have been studied with the help of a Generalized Hydrodynamic (GHD) fluid model in the context of strongly coupled dusty plasma medium in two dimensions. The GHD model treats the strongly coupled dusty plasma system as a visco-elastic medium. The incompressible limit of the GHD model is considered here. The studies carried out here are, however, applicable to a wider class of visco-elastic systems, and are not merely confined to the dusty plasma medium. Our simulations studies show that an initial spectrum that is confined in a limited domain of wave numbers becomes broad, even when the Reynold's number is much less than the critical value required for the onset of turbulence in Newtonian fluids. This is a signature of elastic turbulence, where Weissenberg's number also plays an important role on the onset of turbulence. This feature has been observed in several experiments. It is also shown that the existence of memory relaxation time parameter and the transverse shear wave inhibit the normal process (for 2-D systems) of inverse spectral cascade in this case. A detailed simulation study has been carried out for the understanding of this inhibition.

  15. Structural Analysis of an Avr4 Effector Ortholog Offers Insight into Chitin Binding and Recognition by the Cf-4 Receptor.

    PubMed

    Kohler, Amanda C; Chen, Li-Hung; Hurlburt, Nicholas; Salvucci, Anthony; Schwessinger, Benjamin; Fisher, Andrew J; Stergiopoulos, Ioannis

    2016-08-01

    Chitin is a key component of fungal cell walls and a potent inducer of innate immune responses. Consequently, fungi may secrete chitin-binding lectins, such as the Cf-Avr4 effector protein from the tomato pathogen Cladosporium fulvum, to shield chitin from host-derived chitinases during infection. Homologs of Cf-Avr4 are found throughout Dothideomycetes, and despite their modest primary sequence identity, many are perceived by the cognate tomato immune receptor Cf-4. Here, we determined the x-ray crystal structure of Pf-Avr4 from the tomato pathogen Pseudocercospora fuligena, thus providing a three-dimensional model of an Avr4 effector protein. In addition, we explored structural, biochemical, and functional aspects of Pf-Avr4 and Cf-Avr4 to further define the biology of core effector proteins and outline a conceptual framework for their pleiotropic recognition by single immune receptors. We show that Cf-Avr4 and Pf-Avr4 share functional specificity in binding (GlcNAc)6 and in providing protection against plant- and microbial-derived chitinases, suggesting a broader role beyond deregulation of host immunity. Furthermore, structure-guided site-directed mutagenesis indicated that residues in Pf-Avr4 important for binding chitin do not directly influence recognition by Cf-4 and further suggested that the property of recognition is structurally separated or does not fully overlap with the virulence function of the effector. PMID:27401545

  16. Measured pressure distributions, aerodynamic coefficients and shock shapes on blunt bodies at incidence in hypersonic air and CF4

    NASA Technical Reports Server (NTRS)

    Miller, C. G., III

    1982-01-01

    Pressure distributions, aerodynamic coefficients, and shock shapes were measured on blunt bodies of revolution in Mach 6 CF4 and in Mach 6 and Mach 10 air. The angle of attack was varied from 0 deg to 20 deg in 4 deg increments. Configurations tested were a hyperboloid with an asymptotic angle of 45 deg, a sonic-corner paraboloid, a paraboloid with an angle of 27.6 deg at the base, a Viking aeroshell generated in a generalized orthogonal coordinate system, and a family of cones having a 45 deg half-angle with spherical, flattened, concave, and cusp nose shapes. Real-gas effects were simulated for the hperboloid and paraboloid models at Mach 6 by testing at a normal-shock density ratio of 5.3 in air and 12 CF4. Predictions from simple theories and numerical flow field programs are compared with measurement. It is anticipated that the data presented in this report will be useful for verification of analytical methods for predicting hypersonic flow fields about blunt bodies at incidence.

  17. Multistage coupling of independent laser-plasma accelerators.

    PubMed

    Steinke, S; van Tilborg, J; Benedetti, C; Geddes, C G R; Schroeder, C B; Daniels, J; Swanson, K K; Gonsalves, A J; Nakamura, K; Matlis, N H; Shaw, B H; Esarey, E; Leemans, W P

    2016-02-11

    Laser-plasma accelerators (LPAs) are capable of accelerating charged particles to very high energies in very compact structures. In theory, therefore, they offer advantages over conventional, large-scale particle accelerators. However, the energy gain in a single-stage LPA can be limited by laser diffraction, dephasing, electron-beam loading and laser-energy depletion. The problem of laser diffraction can be addressed by using laser-pulse guiding and preformed plasma waveguides to maintain the required laser intensity over distances of many Rayleigh lengths; dephasing can be mitigated by longitudinal tailoring of the plasma density; and beam loading can be controlled by proper shaping of the electron beam. To increase the beam energy further, it is necessary to tackle the problem of the depletion of laser energy, by sequencing the accelerator into stages, each powered by a separate laser pulse. Here, we present results from an experiment that demonstrates such staging. Two LPA stages were coupled over a short distance (as is needed to preserve the average acceleration gradient) by a plasma mirror. Stable electron beams from a first LPA were focused to a twenty-micrometre radius--by a discharge capillary-based active plasma lens--into a second LPA, such that the beams interacted with the wakefield excited by a separate laser. Staged acceleration by the wakefield of the second stage is detected via an energy gain of 100 megaelectronvolts for a subset of the electron beam. Changing the arrival time of the electron beam with respect to the second-stage laser pulse allowed us to reconstruct the temporal wakefield structure and to determine the plasma density. Our results indicate that the fundamental limitation to energy gain presented by laser depletion can be overcome by using staged acceleration, suggesting a way of reaching the electron energies required for collider applications. PMID:26829223

  18. Tiling analysis of melting in strongly-coupled dusty plasma*

    NASA Astrophysics Data System (ADS)

    Suranga Ruhunusiri, W. D.; Feng, Yan; Liu, Bin; Goree, John

    2010-11-01

    A dusty plasma is an ionized gas containing micron-size particles of solid matter, which collect electrons and ions and become negatively charged. Due to large Coulomb interparticle potential energies, the microparticles represent a strongly-coupled plasma. In the absence of an external disturbance, the microparticles self-organize, arranging themselves in a crystalline lattice, due to their Coulomb interaction. If kinetic energy is added, the arrangement of microparticles becomes disordered, like atoms in a liquid. This melting process can be characterized by a proliferation of defects, which previous experimenters measured using Voronoi analysis. Here we use another method, tiling [1] to quantify defects. We demonstrate this method, which until now has been used only in simulations, in a dusty plasma experiment. A single layer of 4.83 μm polymer microparticles was electrically levitated in a glow discharge argon plasma. The lattice was melted by applying random kicks to the micoparticles from rastered laser beams. We imaged the particle positions and computed the corresponding tiling for both the crystalline lattice and liquid states. [1] Matthew A. Glaser, Phys. Rev A 41, 4585 (1990) ^*Work supported by NSF and NASA.

  19. Imaginary potential of heavy quarkonia moving in strongly coupled plasma

    NASA Astrophysics Data System (ADS)

    Ali-Akbari, M.; Giataganas, D.; Rezaei, Z.

    2014-10-01

    The melting of a heavy quark-antiquark bound state depends on the screening phenomena associated with the binding energy, as well as scattering phenomena associated with the imaginary part of the potential. We study the imaginary part of the static potential of heavy quarkonia moving in the strongly coupled plasma. The imaginary potential dependence on the velocity of the traveling bound states is calculated. Nonzero velocity leads to an increase of the absolute value of the imaginary potential. The enhancement is stronger when the quarkonia move orthogonal to the quark-gluon plasma maximizing the flux between the pair. Moreover, we estimate the thermal width of the moving bound state and find it enhanced compared to the static one. Our results imply that the moving quarkonia dissociate easier than the static ones in agreement with the expectations.

  20. Strongly coupled plasma with electric and magnetic charges

    SciTech Connect

    Liao Jinfeng; Shuryak, Edward

    2007-05-15

    A number of theoretical and lattice results lead us to believe that quark-gluon plasma not too far from T{sub c} contains not only electrically charged quasiparticles - quarks and gluons - but magnetically charged ones--monopoles and dyons--as well. Although binary systems such as charge-monopole and charge-dyon were considered in detail before in both classical and quantum settings, this is the first study of coexisting electric and magnetic particles in a many-body context. We perform a molecular dynamics study of strongly coupled plasmas with {approx}1000 particles and differing fractions of magnetic charge. Correlation functions and Kubo formulas lead to transport properties such as the diffusion constant, the shear viscosity, and electric conductivity: We compare the first two with empirical data from RHIC experiments as well as with results from anti-de-Sitter space/conformal field theory correspondence. We also study a number of collective excitations in these systems.

  1. The energetic coupling of scales in gyrokinetic plasma turbulence

    SciTech Connect

    Teaca, Bogdan; Jenko, Frank

    2014-07-15

    In magnetized plasma turbulence, the couplings of perpendicular spatial scales that arise due to the nonlinear interactions are analyzed from the perspective of the free-energy exchanges. The plasmas considered here, with appropriate ion or electron adiabatic electro-neutrality responses, are described by the gyrokinetic formalism in a toroidal magnetic geometry. Turbulence develops due to the electrostatic fluctuations driven by temperature gradient instabilities, either ion temperature gradient (ITG) or electron temperature gradient (ETG). The analysis consists in decomposing the system into a series of scale structures, while accounting separately for contributions made by modes possessing special symmetries (e.g., the zonal flow modes). The interaction of these scales is analyzed using the energy transfer functions, including a forward and backward decomposition, scale fluxes, and locality functions. The comparison between the ITG and ETG cases shows that ETG turbulence has a more pronounced classical turbulent behavior, exhibiting a stronger energy cascade, with implications for gyrokinetic turbulence modeling.

  2. Fission Yield Measurements by Inductively Coupled Plasma Mass-Spectrometry

    SciTech Connect

    Irina Glagolenko; Bruce Hilton; Jeffrey Giglio; Daniel Cummings; Karl Grimm; Richard McKnight

    2009-11-01

    Correct prediction of the fission products inventory in irradiated nuclear fuels is essential for accurate estimation of fuel burnup, establishing proper requirements for spent fuel transportation and storage, materials accountability and nuclear forensics. Such prediction is impossible without accurate knowledge of neutron induced fission yields. Unfortunately, the accuracy of the fission yields reported in the ENDF/B-VII.0 library is not uniform across all of the data and much of the improvement is desired for certain isotopes and fission products. We discuss our measurements of cumulative fission yields in nuclear fuels irradiated in thermal and fast reactor spectra using Inductively Coupled Plasma Mass Spectrometry.

  3. Ion deposition by inductively coupled plasma mass spectrometry

    SciTech Connect

    Hu, K.; Houk, R.S.

    1996-03-01

    An atmospheric pressure inductively coupled plasma (ICP) is used with a quadrupole mass spectrometer (MS) for ion deposition. The deposited element is introduced as a nebulized aqueous solution. Modifications to the ICP-MS device allow generation and deposition of a mass-resolved beam of {sup 165}Ho{sup +} at 5{times}10{sup 12} ions s{sup {minus}1}. The ICP is a universal, multielement ion source that can potentially be used for applications such as deposition of mixtures of widely varying stoichiometry or of alternating layers of different elements. {copyright} {ital 1996 American Vacuum Society}

  4. Nonlinear wave propagation in a strongly coupled collisional dusty plasma

    SciTech Connect

    Ghosh, Samiran; Gupta, Mithil Ranjan; Chakrabarti, Nikhil; Chaudhuri, Manis

    2011-06-15

    The propagation of a nonlinear low-frequency mode in a strongly coupled dusty plasma is investigated using a generalized hydrodynamical model. For the well-known longitudinal dust acoustic mode a standard perturbative approach leads to a Korteweg-de Vries (KdV) soliton. The strong viscoelastic effect, however, introduced a nonlinear forcing and a linear damping in the KdV equation. This novel equation is solved analytically to show a competition between nonlinear forcing and dissipative damping. The physical consequence of such a solution is also sketched.

  5. Nonlinear wave propagation in a strongly coupled collisional dusty plasma.

    PubMed

    Ghosh, Samiran; Gupta, Mithil Ranjan; Chakrabarti, Nikhil; Chaudhuri, Manis

    2011-06-01

    The propagation of a nonlinear low-frequency mode in a strongly coupled dusty plasma is investigated using a generalized hydrodynamical model. For the well-known longitudinal dust acoustic mode a standard perturbative approach leads to a Korteweg-de Vries (KdV) soliton. The strong viscoelastic effect, however, introduced a nonlinear forcing and a linear damping in the KdV equation. This novel equation is solved analytically to show a competition between nonlinear forcing and dissipative damping. The physical consequence of such a solution is also sketched. PMID:21797497

  6. Nonlinear wave propagation in strongly coupled dusty plasmas.

    PubMed

    Veeresha, B M; Tiwari, S K; Sen, A; Kaw, P K; Das, A

    2010-03-01

    The nonlinear propagation of low-frequency waves in a strongly coupled dusty plasma medium is studied theoretically in the framework of the phenomenological generalized hydrodynamic (GH) model. A set of simplified model nonlinear equations are derived from the original nonlinear integrodifferential form of the GH model by employing an appropriate physical ansatz. Using standard perturbation techniques characteristic evolution equations for finite small amplitude waves are then obtained in various propagation regimes. The influence of viscoelastic properties arising from dust correlation contributions on the nature of nonlinear solutions is discussed. The modulational stability of dust acoustic waves to parallel perturbation is also examined and it is shown that dust compressibility contributions influenced by the Coulomb coupling effects introduce significant modification in the threshold and range of the instability domain. PMID:20365882

  7. Nonlinear wave propagation in strongly coupled dusty plasmas

    SciTech Connect

    Veeresha, B. M.; Tiwari, S. K.; Sen, A.; Kaw, P. K.; Das, A.

    2010-03-15

    The nonlinear propagation of low-frequency waves in a strongly coupled dusty plasma medium is studied theoretically in the framework of the phenomenological generalized hydrodynamic (GH) model. A set of simplified model nonlinear equations are derived from the original nonlinear integrodifferential form of the GH model by employing an appropriate physical ansatz. Using standard perturbation techniques characteristic evolution equations for finite small amplitude waves are then obtained in various propagation regimes. The influence of viscoelastic properties arising from dust correlation contributions on the nature of nonlinear solutions is discussed. The modulational stability of dust acoustic waves to parallel perturbation is also examined and it is shown that dust compressibility contributions influenced by the Coulomb coupling effects introduce significant modification in the threshold and range of the instability domain.

  8. Instabilities in fluorocarbon ICP plasmas

    NASA Astrophysics Data System (ADS)

    Booth, Jean-Paul; Abada, Hana

    2000-10-01

    Several recent studies (Lieberman and al(M. A. Lieberman, A. J. Lichtenberg and A. M. Marakhtanov, App. Phys. Vol75,3617 (1999)), Tuszewski(M. Tuszewski, J. Appl. Phys. 79, 8967 (1996))) have shown the presence of instabilities in low pressure inductively coupled discharges with electronegative gases (O_2, Ar/SF_6). Lieberman and al^1 have proposed an explanation for this effect in terms of electon attachment processes causing an oscillation between capacitive and inductive coupling modes. We have observed similar instabilities in ICP fluorocarbon plasmas (CF_4, C_2F_6, CHF_3) by observing the optical emission from the plasma. In CF4 plasmas, the optical emission is modulated by up to 90% at frequencies 200-1 kHz at 1-20 mtorr with rf powers of 300 W and 500W. We have also observed an interesting phenomenon whereby inductive/capacitive oscillations occur during several hundreds of ms, in between periods of stable capactive operation lasting several hudreds of ms.

  9. Modeling viscosity and diffusion of plasma mixtures across coupling regimes

    NASA Astrophysics Data System (ADS)

    Arnault, Philippe

    2014-10-01

    Viscosity and diffusion of plasma for pure elements and multicomponent mixtures are modeled from the high-temperature low-density weakly coupled regime to the low-temperature high-density strongly coupled regime. Thanks to an atom in jellium modeling, the effect of electron screening on the ion-ion interaction is incorporated through a self-consistent definition of the ionization. This defines an effective One Component Plasma, or an effective Binary Ionic Mixture, that is representative of the strength of the interaction. For the viscosity and the interdiffusion of mixtures, approximate kinetic expressions are supplemented by mixing laws applied to the excess viscosity and self-diffusion of pure elements. The comparisons with classical and quantum molecular dynamics results reveal deviations in the range 20--40% on average with almost no predictions further than a factor of 2 over many decades of variation. Applications in the inertial confinement fusion context could help in predicting the growth of hydrodynamic instabilities.

  10. Dusty Plasmas - Kinetic Studies of Strong Coupling Phenomena

    NASA Astrophysics Data System (ADS)

    Morfill, Gregor

    2011-10-01

    ``Dusty plasmas'' can be found almost everywhere - in the interstellar medium, in star and planet formation, in the solar system in the Earth's atmosphere and in the laboratory. In astrophysical plasmas the dust component accounts for only about 1% of the mass, nevertheless this component has a profound influence on the thermodynamics, the chemistry and the dynamics. Important physical processes are charging, sputtering, cooling, light absorption and radiation pressure, connecting electromagnetic forces to gravity. Surface chemistry is another important aspect. In the laboratory there is great interest in industrial processes (e.g. etching, vapor deposition) and at the fundamental physics level - the main topic here - the study of strong coupling phenomena. Here the dust (or microparticles) are the dominant component of the multi-species plasma. The particles can be observed in real time and pace, individually resolved at all relevant length and time scales. This provides an unprecedented means for studying self-organisation processes in many particle systems including the onset of cooperative phenomena. Due to the comparatively large mass of the microparticles (10-12 to 10-9 g) precision experiments are performed on the ISS. The following topics will be discussed: Phase transitions, phase separation, electrorheology, flow phenomena including the onset of turbulence at the kinetic level.

  11. Low-pressure water-cooled inductively coupled plasma torch

    DOEpatents

    Seliskar, Carl J.; Warner, David K.

    1988-12-27

    An inductively coupled plasma torch is provided which comprises an inner tube, including a sample injection port to which the sample to be tested is supplied and comprising an enlarged central portion in which the plasma flame is confined; an outer tube surrounding the inner tube and containing water therein for cooling the inner tube, the outer tube including a water inlet port to which water is supplied and a water outlet port spaced from the water inlet port and from which water is removed after flowing through the outer tube; and an r.f. induction coil for inducing the plasma in the gas passing into the tube through the sample injection port. The sample injection port comprises a capillary tube including a reduced diameter orifice, projecting into the lower end of the inner tube. The water inlet is located at the lower end of the outer tube and the r.f. heating coil is disposed around the outer tube above and adjacent to the water inlet.

  12. Low-pressure water-cooled inductively coupled plasma torch

    DOEpatents

    Seliskar, C.J.; Warner, D.K.

    1984-02-16

    An inductively coupled plasma torch is provided which comprises an inner tube, including a sample injection port to which the sample to be tested is supplied and comprising an enlarged central portion in which the plasma flame is confined; an outer tube surrounding the inner tube and containing water therein for cooling the inner tube, the outer tube including a water inlet port to which water is supplied and a water outlet port spaced from the water inlet port and from which water is removed after flowing through the outer tube; and an rf induction coil for inducing the plasma in the gas passing into the tube through the sample injection port. The sample injection port comprises a capillary tube including a reduced diameter orifice, projecting into the lower end of the inner tube. The water inlet is located at the lower end of the outer tube and the rf heating coil is disposed around the outer tube above and adjacent to the water inlet.

  13. Complex (dusty) plasmas-kinetic studies of strong coupling phenomena

    SciTech Connect

    Morfill, Gregor E.; Ivlev, Alexei V.; Thomas, Hubertus M.

    2012-05-15

    'Dusty plasmas' can be found almost everywhere-in the interstellar medium, in star and planet formation, in the solar system in the Earth's atmosphere, and in the laboratory. In astrophysical plasmas, the dust component accounts for only about 1% of the mass, nevertheless this component has a profound influence on the thermodynamics, the chemistry, and the dynamics. Important physical processes are charging, sputtering, cooling, light absorption, and radiation pressure, connecting electromagnetic forces to gravity. Surface chemistry is another important aspect. In the laboratory, there is great interest in industrial processes (e.g., etching, vapor deposition) and-at the fundamental level-in the physics of strong coupling phenomena. Here, the dust (or microparticles) are the dominant component of the multi-species plasma. The particles can be observed in real time and space, individually resolved at all relevant length and time scales. This provides an unprecedented means for studying self-organisation processes in many-particle systems, including the onset of cooperative phenomena. Due to the comparatively large mass of the microparticles (10{sup -12}to10{sup -9}g), precision experiments are performed on the ISS. The following topics will be discussed: Phase transitions, phase separation, electrorheology, flow phenomena including the onset of turbulence at the kinetic level.

  14. The Weibel instability in a strongly coupled plasma

    SciTech Connect

    Mahdavi, M. Khanzadeh, H.

    2014-06-15

    In this paper, the growth rate of the Weibel instability is calculated for an energetic relativistic electron beam penetrated into a strongly coupled plasma, where the collision effects of background electron-ion scattering play an important role in equations. In order to calculate the growth rate of the Weibel instability, two different models of anisotropic distribution function are used. First, the distribution of the plasma and beam electrons considered as similar forms of bi-Maxwellian distribution. Second, the distribution functions of the plasma electrons and the beam electrons follows bi-Maxwellian and delta-like distributions, respectively. The obtained results show that the collision effect decreases the growth rate in two models. When the distribution function of electrons beam is in bi-Maxwellian form, the instability growth rate is greater than where the distribution function of beam electrons is in delta-like form, because, the anisotropic temperature for bi-Maxwellian distribution function in velocity space is greater than the delta-like distribution function.

  15. Temperature evolution of strongly coupled electron-ion plasmas

    NASA Astrophysics Data System (ADS)

    Tiwari, Sanat Kumar; Shaffer, Nathaniel; Baalrud, Scott D.

    2015-11-01

    Molecular dynamics simulations of electron-ion plasmas have been carried out, focusing on the classical strongly coupled regime relevant to ultracold neutral plasmas. The interaction of oppositely charged species is modeled using a pseudopotential with a repulsive core at a specified distance ɛ in units of average interparticle spacing. This parameter distinguishes classical from quantum statistical regimes. Simulations are initiated with an equilibration phase in which ions and electrons are held to fixed independent temperatures using a thermostat. Subsequently, the thermostats are removed and the system is allowed to evolve. Two effects are observed: (1) For sufficiently small values of ɛ, the plasma rapidly heats, (2) electrons and ions equilibrate on a longer time scale. The critical ɛ value for the onset of heating and the temperature equilibration rate are compared with existing theory. Excess pressure is calculated in each case based on the equilibrium radial distribution functions obtained during the equilibration phase. The Γ - ɛ phase space is explored, revealing qualitative differences in the temperature evolution due to electron-ion interactions in the classical and quantum regimes. The authors gratefully acknowledge support from NSF grant PHY-1453736.

  16. Comparison between experiment and simulation for argon inductively coupled plasma

    SciTech Connect

    Gao Fei; Zhao Shuxia; Li Xiaosong; Wang Younian

    2009-11-15

    In order to include the nonlocal characteristics of electrons and investigate the inductively coupled plasma (ICP) resources more completely, we have developed a hybrid Monte Carlo (MC)/fluid hybrid model and calculated the axial and radial distributions of electron density, electron temperature, plasma potential, and electron energy distribution functions (EEDFs) of Ar discharge in a planar ICP. Furthermore, to make the model more practical, we still incorporate the effects of metastable atoms, whose sets of rate coefficients and density are, respectively, calculated through the electron MC part and fluid module. Besides, the corresponding Langmuir probe measurements are used to compare these data to validate the simulated results. Under all the selected discharge powers and pressures, the theoretically simulated and experimentally measured quantity profiles agree reasonably with each other, embodied in the generally identical magnitude ranges and spatial distributions. Furthermore, the interpretations about their detailed differences are given, which are based on the designs of both experimental schematic and model configuration. The analysis implements that the inclusions of electron-electron collision and a neutral density distribution into the hybrid model are likely to improve the comparison between the model predictions and experiment diagnostics. Furthermore, the evolution of plasma parameters and EEDFs with discharge conditions is discussed.

  17. Matrix effects in inductively coupled plasma mass spectrometry

    SciTech Connect

    Chen, Xiaoshan

    1995-07-07

    The inductively coupled plasma is an electrodeless discharge in a gas (usually Ar) at atmospheric pressure. Radio frequency energy generated by a RF power source is inductively coupled to the plasma gas through a water cooled load coil. In ICP-MS the {open_quotes}Fassel{close_quotes} TAX quartz torch commonly used in emission is mounted horizontally. The sample aerosol is introduced into the central flow, where the gas kinetic temperature is about 5000 K. The aerosol is vaporized, atomized, excited and ionized in the plasma, and the ions are subsequently extracted through two metal apertures (sampler and skimmer) into the mass spectrometer. In ICP-MS, the matrix effects, or non-spectroscopic interferences, can be defined as the type of interferences caused by dissolved concomitant salt ions in the solution. Matrix effects can be divided into two categories: (1) signal drift due to the deposition of solids on the sampling apertures; and/or (2) signal suppression or enhancement by the presence of the dissolved salts. The first category is now reasonably understood. The dissolved salts, especially refractory oxides, tend to deposit on the cool tip of the sampling cone. The clogging of the orifices reduces the ion flow into the ICP-MS, lowers the pressure in the first stage of ICP-MS, and enhances the level of metal oxide ions. Because the extent of the clogging increases with the time, the signal drifts down. Even at the very early stage of the development of ICP-MS, matrix effects had been observed. Houk et al. found out that the ICP-MS was not tolerant to solutions containing significant amounts of dissolved solids.

  18. Diagnostics of Argon Inductively Coupled Plasma and Dielectric Barrier Discharge Plasma by Optical Emission Spectroscopy

    NASA Astrophysics Data System (ADS)

    Zhang, Jia-liang; Yu, Shi-ji; Ma, Teng-cai; Deng, Xin-lu

    2001-08-01

    An experimental setup was built up to carry out radio frequency (RF) inductively coupled plasma (ICP) and dielectric barrier discharge (DBD), and to depict the optical emission spectra (OES) of the discharges. OES from argon ICP and DBD plasmas in visible and near ultraviolet region were measured. For argon ICP, the higher RF power input (higher than 500 W for our machine), the higher degree of argon plasma ionization. But that doesn't mean a higher mean electron energy. With the increase in the power input, the mean electron energy increases slightly, whereas the density of electron increases apparently. Or, the contrary, argon DBD discharge behaves in the manner of a pulsed DC discharge on optical emission spectroscopy and V-I characteristics. DBD current is composed of a series of pulses equally spaced in temporal domain. The kinetics of DBD emission strength is mainly governed by the frequency of the current pulse.

  19. Feedback control of plasma electron density and ion energy in an inductively coupled plasma etcher

    SciTech Connect

    Lin Chaung; Leou, K.-C.; Huang, H.-M.; Hsieh, C.-H.

    2009-01-15

    Here the authors report the development of a fuzzy logic based feedback control of the plasma electron density and ion energy for high density plasma etch process. The plasma electron density was measured using their recently developed transmission line microstrip microwave interferometer mounted on the chamber wall, and the rf voltage was measured by a commercial impedance meter connected to the wafer stage. The actuators were two 13.56 MHz rf power generators which provided the inductively coupled plasma power and bias power, respectively. The control system adopted the fuzzy logic control algorithm to reduce frequent actuator action resulting from measurement noise. The experimental results show that the first wafer effect can be eliminated using closed-loop control for both poly-Si and HfO{sub 2} etching. In particular, for the HfO2 etch, the controlled variables in this work were much more effective than the previous one where ion current was controlled, instead of the electron density. However, the pressure disturbance effect cannot be reduced using plasma electron density feedback.

  20. Etch Process Sensitivity To An Inductively Coupled Plasma Etcher Treated With Fluorine-Based Plasma

    NASA Astrophysics Data System (ADS)

    Xu, Songlin; Sun, Zhiwen; Qian, Xueyu; Yin, Gerald

    1997-10-01

    Significant etch rate drop after the treatment of an etch chamber with Fluorine-based plasma has been found for some silicon etch processes on an inductively coupled plasma reactor, which might cause problems in IC production line once the etch chamber runs alternative processes with F-based and F-free chemistry, or needs frequent cleaning with F-plasma. In this work, a systematic study of the root cause of process sensitivity to the etch chamber treated with F-plasma has been conducted. The experimental results show that pressure is a key factor to affect the etch rate drop. Processes at high pressure are more sensitive than those at low pressure because the quenching of neutral reactive species becomes more severe after the F-treatment. O2 addition also increases the etch rate sensitivity, basically due to higher O2(subscript: )concentration after F-treatment which enhances the oxidation of silicon. The EDX and XPS elemental analysis of the chamber interior wall reveals a significant composition change after the interaction with F-plasma, the altered surface might accelerate the recombination of free radical species.

  1. A tightly coupled non-equilibrium model for inductively coupled radio-frequency plasmas

    SciTech Connect

    Munafò, A. Alfuhaid, S. A. Panesi, M.; Cambier, J.-L.

    2015-10-07

    The objective of the present work is the development of a tightly coupled magneto-hydrodynamic model for inductively coupled radio-frequency plasmas. Non Local Thermodynamic Equilibrium (NLTE) effects are described based on a hybrid State-to-State approach. A multi-temperature formulation is used to account for thermal non-equilibrium between translation of heavy-particles and vibration of molecules. Excited electronic states of atoms are instead treated as separate pseudo-species, allowing for non-Boltzmann distributions of their populations. Free-electrons are assumed Maxwellian at their own temperature. The governing equations for the electro-magnetic field and the gas properties (e.g., chemical composition and temperatures) are written as a coupled system of time-dependent conservation laws. Steady-state solutions are obtained by means of an implicit Finite Volume method. The results obtained in both LTE and NLTE conditions over a broad spectrum of operating conditions demonstrate the robustness of the proposed coupled numerical method. The analysis of chemical composition and temperature distributions along the torch radius shows that: (i) the use of the LTE assumption may lead to an inaccurate prediction of the thermo-chemical state of the gas, and (ii) non-equilibrium phenomena play a significant role close the walls, due to the combined effects of Ohmic heating and macroscopic gradients.

  2. A tightly coupled non-equilibrium model for inductively coupled radio-frequency plasmas

    NASA Astrophysics Data System (ADS)

    Munafò, A.; Alfuhaid, S. A.; Cambier, J.-L.; Panesi, M.

    2015-10-01

    The objective of the present work is the development of a tightly coupled magneto-hydrodynamic model for inductively coupled radio-frequency plasmas. Non Local Thermodynamic Equilibrium (NLTE) effects are described based on a hybrid State-to-State approach. A multi-temperature formulation is used to account for thermal non-equilibrium between translation of heavy-particles and vibration of molecules. Excited electronic states of atoms are instead treated as separate pseudo-species, allowing for non-Boltzmann distributions of their populations. Free-electrons are assumed Maxwellian at their own temperature. The governing equations for the electro-magnetic field and the gas properties (e.g., chemical composition and temperatures) are written as a coupled system of time-dependent conservation laws. Steady-state solutions are obtained by means of an implicit Finite Volume method. The results obtained in both LTE and NLTE conditions over a broad spectrum of operating conditions demonstrate the robustness of the proposed coupled numerical method. The analysis of chemical composition and temperature distributions along the torch radius shows that: (i) the use of the LTE assumption may lead to an inaccurate prediction of the thermo-chemical state of the gas, and (ii) non-equilibrium phenomena play a significant role close the walls, due to the combined effects of Ohmic heating and macroscopic gradients.

  3. Dust-acoustic shocks in strongly coupled dusty plasmas

    NASA Astrophysics Data System (ADS)

    Cousens, S. E.; Yaroshenko, V. V.; Sultana, S.; Hellberg, M. A.; Verheest, F.; Kourakis, I.

    2014-04-01

    Electrostatic dust-acoustic shock waves are investigated in a viscous, complex plasma consisting of dust particles, electrons, and ions. The system is modelled using the generalized hydrodynamic equations, with strong coupling between the dust particles being accounted for by employing the effective electrostatic temperature approach. Using a reductive perturbation method, it is demonstrated that this model predicts the existence of weakly nonlinear dust-acoustic shock waves, arising as solutions to Burgers's equation, in which the nonlinear forces are balanced by dissipative forces, in this case, associated with viscosity. The evolution and stability of dust-acoustic shocks is investigated via a series of numerical simulations, which confirms our analytical predictions on the shock characteristics.

  4. Quantum simulations of strongly coupled quark-gluon plasma

    SciTech Connect

    Filinov, V. S.; Ivanov, Yu. B.; Bonitz, M.; Levashov, P. R.; Fortov, V. E.

    2011-09-15

    A strongly coupled quark-gluon plasma (QGP) of heavy constituent quasiparticles is studied by a path-integral Monte-Carlo method. This approach is a quantum generalization of the model developed by B.A. Gelman, E.V. Shuryak, and I. Zahed. It is shown that this method is able to reproduce the QCD lattice equation of state and also yields valuable insight into the internal structure of the QGP. The results indicate that the QGP reveals liquid-like rather than gas-like properties. At temperatures just above the critical one it was found that bound quark-antiquark states still survive. These states are bound by effective string-like forces and turn out to be colorless. At the temperature as large as twice the critical one no bound states are observed. Quantum effects turned out to be of prime importance in these simulations.

  5. Inductively Coupled Plasma Mass Spectrometry Uranium Error Propagation

    SciTech Connect

    Hickman, D P; Maclean, S; Shepley, D; Shaw, R K

    2001-07-01

    The Hazards Control Department at Lawrence Livermore National Laboratory (LLNL) uses Inductively Coupled Plasma Mass Spectrometer (ICP/MS) technology to analyze uranium in urine. The ICP/MS used by the Hazards Control Department is a Perkin-Elmer Elan 6000 ICP/MS. The Department of Energy Laboratory Accreditation Program requires that the total error be assessed for bioassay measurements. A previous evaluation of the errors associated with the ICP/MS measurement of uranium demonstrated a {+-} 9.6% error in the range of 0.01 to 0.02 {micro}g/l. However, the propagation of total error for concentrations above and below this level have heretofore been undetermined. This document is an evaluation of the errors associated with the current LLNL ICP/MS method for a more expanded range of uranium concentrations.

  6. Particle dynamics in a strongly-coupled dusty plasma

    NASA Astrophysics Data System (ADS)

    Goree, J.; Pieper, J. B.

    1996-11-01

    We have used video imaging to study the dynamics of 9 μ m plastic spheres suspended in low-power Krypton discharges. The spheres, which are highly charged and levitated by the electrode sheath, form a strongly-coupled system. Using a digitized series of images, we tracked individual particles and measured collective and random particle motions.footnote J. B. Pieper and J. Goree, submitted to PRL Dust acoustic waves were excited at <= 10 Hz and their dispersion relation verified. Fitting the measured and theoretical dispersion relations also give a measurement of the particle charge and the "linearized" Debye length. The temperature of random particle motion in the horizontal plane (parallel to the electrode) was measured to be 2-10 times room temperature and about 2 times the temperature in the vertical plane. It is proposed that the particles are heated by low-frequency (kHz) electrostatic plasma fluctuations. Work supported by NSF and NASA

  7. Particle dynamics in a strongly-coupled dusty plasma

    NASA Astrophysics Data System (ADS)

    Quinn, R. A.; Goree, J.; Pieper, J. B.

    1996-10-01

    We have used video imaging to study the dynamics of 9 μ m plastic spheres in low-power Krypton discharges. The spheres, which are highly charged and levitated by the electrode sheath, form a strongly-coupled system. Using a digitized series of images, we tracked individual particles and measured collective and random particle motions.footnote Pieper and Goree, submitted to PRL Dust acoustic waves were excited at <= 10 Hz and their dispersion relation verified. The temperature of random particle motion in the horizontal plane (parallel to the electrode) was measured to be 2-10 times room temperature and about 2 times the temperature in the vertical plane. It is proposed that the particles are heated by low-frequency (kHz) electrostatic plasma fluctuations.

  8. Transition of electron kinetics in weakly magnetized inductively coupled plasmas

    SciTech Connect

    Kim, Jin-Yong; Lee, Hyo-Chang; Kim, Young-Do; Chung, Chin-Wook; Kim, Young-Cheol

    2013-10-15

    Transition of the electron kinetics from nonlocal to local regime was studied in weakly magnetized solenoidal inductively coupled plasma from the measurement of the electron energy probability function (EEPF). Without DC magnetic field, the discharge property was governed by nonlocal electron kinetics at low gas pressure. The electron temperatures were almost same in radial position, and the EEPFs in total electron energy scale were radially coincided. However, when the DC magnetic field was applied, radial non-coincidence of the EEPFs in total electron energy scale was observed. The electrons were cooled at the discharge center where the electron heating is absent, while the electron temperature was rarely changed at the discharge boundary with the magnetic field. These changes show the transition from nonlocal to local electron kinetics and the transition is occurred when the electron gyration diameter was smaller than the skin depth. The nonlocal to local transition point almost coincided with the calculation results by using nonlocal parameter and collision parameter.

  9. Generation of strongly coupled plasmas by high power excimer laser

    NASA Astrophysics Data System (ADS)

    Zhu, Yongxiang; Liu, Jingru; Zhang, Yongsheng; Hu, Yun; Zhang, Jiyan; Zheng, Zhijian; Ye, Xisheng

    2013-05-01

    (ultraviolet). To generate strongly coupled plasmas (SCP) by high power excimer laser, an Au-CH-Al-CH target is used to make the Al sample reach the state of SCP, in which the Au layer transforms laser energy to X-ray that heating the sample by volume and the CH layers provides necessary constraints. With aid of the MULTI-1D code, we calculate the state of the Al sample and its relationship with peak intensity, width and wavelength of laser pulses. The calculated results suggest that an excimer laser with peak intensity of the magnitude of 1013W/cm2 and pulse width being 5ns - 10ns is suitable to generate SCP with the temperature being tens of eV and the density of electron being of the order of 1022/cm-3. Lasers with shorter wavelength, such as KrF laser, are preferable.

  10. Electron heating in capacitively coupled RF plasmas: a unified scenario

    NASA Astrophysics Data System (ADS)

    Brinkmann, Ralf Peter

    2016-02-01

    Electron heating in radio-frequency capacitively coupled plasmas (RF-CCP) is studied from first principles. The starting points are the electron equations of continuity and motion, with ionization neglected but electric and pressure forces and elastic collisions with the neutral background taken into account. Poisson’s equation self-consistently calculates the electric field; the ion density is assumed as a given. Postulating that the Debye length {λ\\text{D}} is small compared to the sheath length scale l and the applied frequency {ω\\text{RF}} is small compared to the electron plasma frequency {ω\\text{pe}} , an asymptotic expansion in the smallness parameter ε ={λ\\text{D}}/l∼ {ω\\text{RF}}/{ω\\text{pe}} is conducted. As has been demonstrated before (Brinkmann 2015 Plasma Sources Sci. Technol. 24 064002), this ansatz gives an expression—the smooth step model (SSM)—which yields (i) the space charge field in the unipolar region, (ii) the generalized Ohmic field in the ambipolar region, and (iii) a smooth interpolation for the rapid transition in between. Using the SSM and formulas for the electron density and the electron flux, expressions for the electric force and the electric power density are established which hold up to O≤ft(ε \\right) . Integrating over the sheath and taking the phase average, a representation for the total dissipated power is found as a sum of four physically distinct contributions. All terms correspond to electron heating mechanisms which are (explicitly or implicitly) already known but were so far discussed only within mutually incompatible frameworks.