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Sample records for cubic sic films

  1. Compensation in epitaxial cubic SiC films

    NASA Technical Reports Server (NTRS)

    Segall, B.; Alterovitz, S. A.; Haugland, E. J.; Matus, L. G.

    1986-01-01

    Hall measurements on four n-type cubic SiC films epitaxially grown by chemical vapor deposition on SiC substrates are reported. The temperature dependent carrier concentrations indicate that the samples are highly compensated. Donor ionization energies, E sub D, are less than one half the values previously reported. The values for E sub D and the donor concentration N sub D, combined with results for small bulk platelets with nitrogen donors, suggest the relation E sub D (N sub D) = E sub D(O) - alpha N sub N sup 1/3 for cubic SiC. A curve fit gives alpha is approx 2.6x10/5 meV cm and E sub D (O) approx 48 meV, which is the generally accepted value of E sub D(O) for nitrogen donors in cubic SiC.

  2. Stress reduction in epitaxial GaN films on Si using cubic SiC as intermediate layers

    NASA Astrophysics Data System (ADS)

    Komiyama, Jun; Abe, Yoshihisa; Suzuki, Shunichi; Nakanishi, Hideo

    2006-08-01

    Stress in the epitaxial films of GaN on Si is reduced by using SiC as intermediate layers. The crystalline films of cubic SiC (0-1μm), thin AlN (50nm), and GaN (1-3μm) were prepared on 3in. (1 1 1) Si substrates—stacked in the order of GaN /AlN/SiC/Si—by metalorganic vapor-phase epitaxy. It is revealed by Raman spectroscopy that the tensile stress in GaN is reduced to half (reduction of about 300MPa) for GaN on Si with SiC intermediate layers compared with GaN on Si without SiC intermediate layers. Because of stress reduction, crack-free GaN on Si with a thickness of 2μm was obtained by using SiC intermediate layers. Cracking was minimized even on thicker GaN on Si (3μm thick) with SiC intermediate layers. The SiC intermediate layers are promising for the realization of nitride based electronic devices on Si.

  3. Ellipsometric study of cubic SiC

    NASA Technical Reports Server (NTRS)

    Alterovitz, Samuel A.; Shoemaker, Neil S.; Powell, J. A.

    1990-01-01

    Variable angle spectroscopic ellipsometry (VASE) was applied to cubic SiC. This technique gives absolute values of the refractive index (n) and the extinction coefficient (k) of a substrate and/or a thin film of unknown material. The samples were grown by chemical vapor deposition (CVD) on p-type silicon. The substrate was aligned either on the (001) axis or 1 degree of (001). Several growth temperatures and growth durations were used. The samples were divided into two groups: (1) thick films of order 10 microns grown near optimal conditions of temperature, flow, and gas ratio; and (2) thin films of order 100 A grown at various temperatures. The ellipsometric results for samples in group 1 were analyzed using a two-phase model (substrate and ambient). Results show that for wavelengths in the visible, the refractive index of these CVD samples is equal to that reported for single crystal cubic SiC, within the experimental error, which is on the order of 1 percent. However, the extinction coefficient has a relatively large value, even above the band gap. The absorption is sample dependent and has a broad peak in the visible. The results for samples in group 2 were analyzed using a three-phase model (substrate, film, and ambient). The dielectric functions of the film, deducted from the measured n and k, were further analyzed using the effective medium approximation. The results show that the films contain 30 to 40 vol. percent amorphous silicon, i.e., silicon with only short-range order.

  4. Surface charges and optical characteristic of colloidal cubic SiC nanocrystals

    PubMed Central

    2011-01-01

    Colloidal cubic silicon carbide (SiC) nanocrystals with an average diameter of 4.4 nm have been fabricated by anisotropic wet chemical etching of microsized cubic SiC powder. Fourier transform infrared spectra show that these cubic SiC nanocrystals contain carboxylic acid, SiH, CH, and CHx groups. UV/Vis absorption and photoluminescence (PL) spectroscopy clearly indicate that water and ethanol colloidal suspensions of the as-fabricated colloidal samples exhibit strong and above band gap blue and blue-green emissions. The cubic SiC nanocrystals show different surface charges in water and ethanol solutions due to the interaction of water molecules with polar Si-terminated surfaces of cubic SiC nanocrystals. The results explain the distinctive optical characteristics of colloidal cubic SiC nanocrystals in water and ethanol, and reveal that quantum confinement and surface charges play a great role in determining the optical characteristics of colloidal cubic SiC nanocrystals. PMID:21762496

  5. Surface charges and optical characteristic of colloidal cubic SiC nanocrystals

    NASA Astrophysics Data System (ADS)

    Li, Yong; Chen, Changxin; Li, Jiang-Tao; Yang, Yun; Lin, Zhi-Ming

    2011-07-01

    Colloidal cubic silicon carbide (SiC) nanocrystals with an average diameter of 4.4 nm have been fabricated by anisotropic wet chemical etching of microsized cubic SiC powder. Fourier transform infrared spectra show that these cubic SiC nanocrystals contain carboxylic acid, SiH, CH, and CHx groups. UV/Vis absorption and photoluminescence (PL) spectroscopy clearly indicate that water and ethanol colloidal suspensions of the as-fabricated colloidal samples exhibit strong and above band gap blue and blue-green emissions. The cubic SiC nanocrystals show different surface charges in water and ethanol solutions due to the interaction of water molecules with polar Si-terminated surfaces of cubic SiC nanocrystals. The results explain the distinctive optical characteristics of colloidal cubic SiC nanocrystals in water and ethanol, and reveal that quantum confinement and surface charges play a great role in determining the optical characteristics of colloidal cubic SiC nanocrystals.

  6. Structural Evolution of SiC Films During Plasma-Assisted Chemical Vapour Deposition

    NASA Astrophysics Data System (ADS)

    Ding, Siye; Yan, Guanchao; Zhu, Xiaodong; Zhou, Haiyang

    2009-04-01

    Evolution of chemical bonding configurations for the films deposited from hexamethyldisiloxane (HMDSO) diluted with H2 during plasma assisted chemical vapour deposition is investigated. In the experiment a small amount of CH4 was added to adjust the plasma environment and modify the structure of the deposited films. The measurements of Raman spectroscopy and X-ray diffraction (XRD) revealed the production of 6H-SiC embedded in the amorphous matrix without the input of CH4. As CH4 was introduced into the deposition reaction, the transition of 6H-SiC to cubic SiC in the films took place, and also the film surfaces changed from a structure of ellipsoids to cauliflower-like shapes. With a further increase of CH4 in the flow ratio, the obtained films varied from Si-C bonding dominant to a sp2/sp3 carbon-rich composition.

  7. Synchronistic preparation of fibre-like SiC and cubic-ZrO{sub 2}/SiC composite from zircon via carbothermal reduction process

    SciTech Connect

    Xu, Youguo; Liu, Yangai; Huang, Zhaohui; Fang, Minghao; Hu, Xiaozhi; Yin, Li; Huang, Juntong

    2013-01-15

    Graphical abstract: Display Omitted Highlights: ► Zircon carbothermal reduction was carried out in a tailor-made device at high-temperature air atmosphere. ► Fibre-like SiC and cubic-ZrO{sub 2}/SiC composite were obtained synchronically. ► Zirconium and silicon in zircon ore was initial separated. ► [SiO{sub 4}] was mutated to fibre-like SiC, while [ZrO{sub 8}] was transformed to cubic ZrO{sub 2}. ► The SiC were surprisingly enriched in the reducing atmosphere charred coal particles layers by gas–solid reaction. -- Abstract: Fibre-like SiC and cubic-ZrO{sub 2}/SiC composite were prepared respectively from zircon with yttrium oxide addition via carbothermal reduction process at 1600 °C for 4 h in an air atmosphere furnace, where the green samples were immerged in charred coal particles inside a high-temperature enclosed corundum crucible. The reaction products were characterized by XRD, XRF, XPS and SEM. The results indicate that ZrO{sub 2} in the products was mainly existed in the form of cubic phase. The reacted samples mainly contain cubic ZrO{sub 2}, β-SiC and trace amounts of zircon, with the SiC accounting for 14.8 wt%. Furthermore, a large quantity of fibre-like SiC was surprisingly found to concentrate in the charred coal particles layers around the samples. This study obtains fibre-like SiC and cubic-ZrO{sub 2}/SiC composite synchronically from zircon via carbothermal reduction process, which also bring a value-added high-performance application for natural zircon.

  8. Atomic probe microscopy of 3C SiC films grown on 6H SiC substrates

    NASA Technical Reports Server (NTRS)

    Steckl, A. J.; Roth, M. D.; Powell, J. A.; Larkin, D. J.

    1993-01-01

    The surface of 3C SiC films grown on 6H SiC substrates has been studied by atomic probe microscopy in air. Atomic-scale images of the 3C SiC surface have been obtained by STM which confirm the 111 line type orientation of the cubic 3C layer grown on the 0001 plane type surface of the hexagonal 6H substrate. The nearest-neighbor atomic spacing for the 3C layer has been measured to be 3.29 +/- 0.2 A, which is within 7 percent of the bulk value. Shallow terraces in the 3C layer have been observed by STM to separate regions of very smooth growth in the vicinity of the 3C nucleation point from considerably rougher 3C surface regions. These terraces are oriented at right angles to the growth direction. Atomic force microscopy has been used to study etch pits present on the 6H substrate due to high temperature HCl cleaning prior to CVD growth of the 3C layer. The etch pits have hexagonal symmetry and vary in depth from 50 nm to 1 micron.

  9. Investigations of Ar ion irradiation effects on nanocrystalline SiC thin films

    NASA Astrophysics Data System (ADS)

    Craciun, V.; Craciun, D.; Socol, G.; Behdad, S.; Boesl, B.; Himcinschi, C.; Makino, H.; Socol, M.; Simeone, D.

    2016-06-01

    The effects of 800 keV Ar ion irradiation on thin nanocrystalline SiC films grown on (100) Si substrates using the pulsed laser deposition (PLD) technique were investigated. On such PLD grown films, which were very dense, flat and smooth, X-ray reflectivity, glancing incidence X-ray diffraction and nanoindentation investigations were easily performed to evaluate changes induced by irradiation on the density, surface roughness, crystalline structure, and mechanical properties. Results indicated that the SiC films retained their crystalline nature, the cubic phase partially transforming into the hexagonal phase, which had a slightly higher lattice parameter then the as-deposited films. Simulations of X-ray reflectivity curves indicated a 3% decrease of the films density after irradiation. Nanoindentation results showed a significant decrease of the hardness and Young's modulus values with respect to those measured on as-deposited films. Raman and X-ray photoelectron spectroscopy investigations found an increase of the Csbnd C bonds and a corresponding decrease of the Sisbnd C bonds in the irradiated area, which could explain the degradation of mechanical properties.

  10. Study of CVD SiC thin film for space mirror

    NASA Astrophysics Data System (ADS)

    Zhang, Jianhan; Zhang, Yumin; Han, Jiecai; He, Xiaodong

    2006-01-01

    The performance of space mirror lied on the properties of the mirror surface material to a great extent. In this paper, the silicon carbide thin film deposited on reaction-bonded silicon carbide (RBSC) space mirror blank was produced by Chemical Vapor Deposition (CVD) process. Some mechanical and physical properties of the SiC thin film were tested because they were important to study ability to work of space mirror. The result of XRD phase analysis indicated that the component of the SiC thin film was β-SiC. The micro hardness of the film was tested. The thickness of SiC thin film was tested using needle touch contour graph. The results showed that the thickness of SiC film was about 20 μm and film was even in the macro scope. The adhesion strength of SiC thin film and RBSC substrate was tested by scratch method and the results showed that was excellent. The residual stress of SiC thin film was tested by X-ray, at the same time; the origin of residual stress and the calculation of thermal stress were discussed. In the room temperature, the residual stress of the SiC film was compressive. After precision grinding, the surface topography and roughness of the SiC thin film was tested by Atomic Force Microscope (AFM). The results showed that the surface of SiC thin film had extremely low surface roughness and high surface form accuracy. The thermal shock resistance of SiC film was fine by tested.

  11. Homogeneous nanocrystalline cubic silicon carbide films prepared by inductively coupled plasma chemical vapor deposition.

    PubMed

    Cheng, Qijin; Xu, S; Long, Jidong; Huang, Shiyong; Guo, Jun

    2007-11-21

    Silicon carbide films with different carbon concentrations x(C) have been synthesized by inductively coupled plasma chemical vapor deposition from a SiH(4)/CH(4)/H(2) gas mixture at a low substrate temperature of 500 °C. The characteristics of the films were studied by x-ray photoelectron spectroscopy, x-ray diffraction, scanning electron microscopy, high-resolution transmission electron microscopy, Fourier transform infrared absorption spectroscopy, and Raman spectroscopy. Our experimental results show that, at x(C) = 49 at.%, the film is made up of homogeneous nanocrystalline cubic silicon carbide without any phase of silicon, graphite, or diamond crystallites/clusters. The average size of SiC crystallites is approximately 6 nm. At a lower value of x(C), polycrystalline silicon and amorphous silicon carbide coexist in the films. At a higher value of x(C), amorphous carbon and silicon carbide coexist in the films. PMID:21730481

  12. Exciton-polariton state in nanocrystalline SiC films

    NASA Astrophysics Data System (ADS)

    Semenov, А. V.; Lopin, А. V.

    2016-05-01

    We studied the features of optical absorption in the films of nanocrystalline SiC (nc-SiC) obtained on the sapphire substrates by the method of direct ion deposition. The optical absorption spectra of the films with a thickness less than ~500 nm contain a maximum which position and intensity depend on the structure and thickness of the nc-SiC films. The most intense peak at 2.36 eV is observed in the nc-SiC film with predominant 3C-SiC polytype structure and a thickness of 392 nm. Proposed is a resonance absorption model based on excitation of exciton polaritons in a microcavity. In the latter, under the conditions of resonance, there occurs strong interaction between photon modes of light with λph=521 nm and exciton of the 3С polytype with an excitation energy of 2.36 eV that results in the formation of polariton. A mismatch of the frequencies of photon modes of the cavity and exciton explains the dependence of the maximum of the optical absorption on the film thickness.

  13. Low pressure growth of cubic boron nitride films

    NASA Technical Reports Server (NTRS)

    Ong, Tiong P. (Inventor); Shing, Yuh-Han (Inventor)

    1997-01-01

    A method for forming thin films of cubic boron nitride on substrates at low pressures and temperatures. A substrate is first coated with polycrystalline diamond to provide a uniform surface upon which cubic boron nitride can be deposited by chemical vapor deposition. The cubic boron nitride film is useful as a substitute for diamond coatings for a variety of applications in which diamond is not suitable. any tetragonal or hexagonal boron nitride. The cubic boron nitride produced in accordance with the preceding example is particularly well-suited for use as a coating for ultra hard tool bits and abrasives, especially those intended to use in cutting or otherwise fabricating iron.

  14. Growth of cubic SiC single crystals by the physical vapor transport technique

    NASA Astrophysics Data System (ADS)

    Semmelroth, K.; Krieger, M.; Pensl, G.; Nagasawa, H.; Püsche, R.; Hundhausen, M.; Ley, L.; Nerding, M.; Strunk, H. P.

    2007-10-01

    Suitable process parameters for the growth of cubic 3C-SiC single crystals via the seeded physical vapor transport (PVT) technique, also known as the modified Lely method, have been determined. Free-standing, 200 μm thick 3C-SiC epilayers with (0 0 1)- or (0 0 1¯)-face grown on undulant Si (0 0 1) as well as 3C-SiC platelets with [1 1 1]- or [1¯ 1¯ 1¯]-orientation grown by thermal decomposition of methyl trichlorosilane in hydrogen were employed as seed crystals. The source material consisted of stoichiometric SiC; in addition, a separate Si source was deposited in the furnace at a temperature of about 1500 °C. The temperature of the seed crystals was kept at about 1900 °C. Stable growth of 3C-SiC bulk material of high crystalline quality was reached on 3C-SiC seed crystals with (0 0 1)-face providing a low density of planar defects and at near-thermal-equilibrium conditions resulting in a reduction of internal stress and as a consequence in avoiding the generation of new extended crystal defects. The growth rate achieved under these conditions was approximately 0.05 mm/h. The nitrogen donor concentration in the grown 3C-SiC crystals was determined to be equal to (2-6)×10 18 cm -3.

  15. Effects of Ni doping and structural defects on magnetic properties of annealed SiC films

    NASA Astrophysics Data System (ADS)

    Fu, Yuting; Jin, Xin; Sun, Ning; Li, Chunjing; An, Yukai; Liu, Jiwen

    2016-08-01

    Ni-doped SiC films deposited on Si (100) substrates prepared by RF-magnetron sputtering were discussed in this paper. The results show that with reference to the as-deposited as well as annealing at 800 °C. C atoms were substituted by Ni atoms in the 3Csbnd SiC lattice and Ni-related secondary phase cannot be detected. After annealing at 1200 °C, the crystal quality improved obviously while the majority of Ni atoms form the Ni2Si secondary phase. Temperature dependent on resistivity reveals that the conduction mechanism is dominated by Mott variable range hopping behavior for the Ni-doped SiC films, confirming that the carriers are localized. All the films are ferromagnetic at 300 K and annealing can evidently improve the room-temperature (RT) ferromagnetism. The bound magnetic polarons should be responsible for the RT ferromagnetism of the Ni-doped SiC films.

  16. Ultra-Low-Cost Room Temperature SiC Thin Films

    NASA Technical Reports Server (NTRS)

    Faur, Maria

    1997-01-01

    The research group at CSU has conducted theoretical and experimental research on 'Ultra-Low-Cost Room Temperature SiC Thin Films. The effectiveness of a ultra-low-cost room temperature thin film SiC growth technique on Silicon and Germanium substrates and structures with applications to space solar sells, ThermoPhotoVoltaic (TPV) cells and microelectronic and optoelectronic devices was investigated and the main result of this effort are summarized.

  17. ToF-MEIS stopping measurements in thin SiC films

    NASA Astrophysics Data System (ADS)

    Linnarsson, M. K.; Khartsev, S.; Primetzhofer, D.; Possnert, G.; Hallén, A.

    2014-08-01

    Electronic stopping in thin, amorphous, SiC films has been studied by time-of-flight medium energy ion scattering and conventional Rutherford backscattering spectrometry. Amorphous SiC films (8, 21 and 36 nm) were prepared by laser ablation using a single crystalline silicon carbide target. Two kinds of substrate films, one with a lower atomic mass (carbon) and one with higher atomic mass (iridium) compared to silicon has been used. Monte Carlo simulations have been used to evaluate electronic stopping from the shift in energy for the signal scattered from Ir with and without SiC. The two kinds of samples are used to illustrate the strength and challenges for ToF-MEIS compared to conventional RBS.

  18. Time-Domain Thermoreflectance Measurements of Thermal Transport in Amorphous SiC Thin Films

    NASA Astrophysics Data System (ADS)

    Daly, Brian; Hondongwa, Donald; King, Sean

    2010-03-01

    We present ultrafast optical pump-probe measurements of thermal transport in a series of amorphous SiC samples. The samples were grown on Si wafers by plasma enhanced chemical vapor deposition utilizing various combinations of methylsilanes and H2 and He diluent gases. The sample films were well characterized and found to have densities (1.3 -- 2.3 g cm-3) and dielectric constants (4.0 -- 7.2) that spanned a wide range of values. Prior to their measurement, the samples were coated with 40-70 nm of polycrystalline Al. The pump-probe measurements were performed at room temperature using a modelocked Ti:sapphire laser that produced sub-picosecond pulses of a few nJ. The pulses heat the Al coating, causing a transient reflectivity change. As the Al film cools into the SiC film, the reflectivity change can be measured, giving a measure of the thermal effusivity of the SiC film. We then extract values for the thermal conductivity of the SiC films and find that it varies from less than half of the thermal conductivity of amorphous SiO2 for the lower density materials to somewhat larger than amorphous SiO2 for the highest density films.

  19. Conformal Thin Film Packaging for SiC Sensor Circuits in Harsh Environments

    NASA Technical Reports Server (NTRS)

    Scardelletti, Maximilian C.; Karnick, David A.; Ponchak, George E.; Zorman, Christian A.

    2011-01-01

    In this investigation sputtered silicon carbide annealed at 300 C for one hour is used as a conformal thin film package. A RF magnetron sputterer was used to deposit 500 nm silicon carbide films on gold metal structures on alumina wafers. To determine the reliability and resistance to immersion in harsh environments, samples were submerged in gold etchant for 24 hours, in BOE for 24 hours, and in an O2 plasma etch for one hour. The adhesion strength of the thin film was measured by a pull test before and after the chemical immersion, which indicated that the film has an adhesion strength better than 10(exp 8) N/m2; this is similar to the adhesion of the gold layer to the alumina wafer. MIM capacitors are used to determine the dielectric constant, which is dependent on the SiC anneal temperature. Finally, to demonstrate that the SiC, conformal, thin film may be used to package RF circuits and sensors, an LC resonator circuit was fabricated and tested with and without the conformal SiC thin film packaging. The results indicate that the SiC coating adds no appreciable degradation to the circuits RF performance. Index Terms Sputter, silicon carbide, MIM capacitors, LC resonators, gold etchants, BOE, O2 plasma

  20. SiC Nanowire Film Photodetectors: A Promising Candidate Toward High Temperature Photodetectors.

    PubMed

    Chong, Haining; Yang, Huijun; Yang, Weiyou; Zheng, Jinju; Shang, Minghui; Yang, Zuobao; Wei, Guodong; Gao, Fengmei

    2016-04-01

    In this study, UV photodetectors (PDs) based on SiC nanowire films have been successfully prepared by a simple and low-cost drip-coating method followed by sintering at 500 °C. The corresponding electrical characterizations clearly demonstrate that the SiC nanowire based PD devices can be regarded as a promising candidate for UV PDs. The PDs can exhibit the excellent performances of fast, high sensitivity, linearity, and stable response, which can thus achieve on-line monitoring of weak UV light. Furthermore, the SiC nanowire-based PDs enable us to fabricate detectors working under high temperature as high as 150 °C. The high photosensitivity and rapid photoresponse for the PDs can be attributed to the superior single crystalline quality of SiC nanowires and the ohmic contact between the electrodes and nanowires. PMID:27451712

  1. Effects of thermal annealing on photoluminescence of Si+/C+ implanted SiO2 films

    NASA Astrophysics Data System (ADS)

    Chen, Yin-Yu; Chao, Der-Sheng; Tsai, Hsu-Sheng; Liang, Jenq-Horng

    2016-04-01

    The mechanisms of photoluminescence (PL) originating from Si+/C+ implanted SiO2 are still unclear and need to be clarified. Thus, the purpose of this study is to thoroughly investigate the effects of ion implantation and post-annealing temperature on microstructures and PL characteristics of the Si+/C+ implanted SiO2 films. A comparative analysis was also conducted to clarify the different optical properties between the Si+ and Si+/C+ implanted SiO2 films. In this study, thermally-grown SiO2 films on Si substrates were used as the matrix materials. The Si+ ions and C+ ions were separately implanted into the SiO2 films at room temperature. After ion implantation, the post-annealing treatments were carried out using the furnace annealing (FA) method at various temperatures (600-1100 °C) for 1 h in a N2 ambient. The PL characteristics of the implanted SiO2 films were analyzed using a fluorescence spectrophotometer. The results revealed that the distinct PL peaks were observed at approximately 310, 450 and 650 nm in the Si+-implanted SiO2 films, which can be attributed to the defects, the so-called oxygen deficiency centers (ODCs) and non-bridging oxygen hole centers (NBOHCs), in the materials. In contrast to the Si+ ion implantation, the SiO2 films which were sequentially implanted with Si+ and C+ ions and annealed at 1100 °C can emit white light corresponding to the PL peaks located at around 420, 520 and 720 nm, those can be assigned to the Si-C bonding, C-C graphite-like structure (sp2), and Si nanocrystals, respectively. Moreover, a correlation between the optical properties, microstructures, and bonding configurations of the Si+/C+ implanted SiO2 films was also established in this study.

  2. Nanomechanical properties of SiC films grown from C{sub 60} precursors using atomic force microscopy

    SciTech Connect

    Morse, K.; Balooch, M.; Hamza, A.V.; Belak, J.

    1994-12-01

    The mechanical properties of SiC films grown via C{sub 60} precursors were determined using atomic force microscopy (AFM). Conventional silicon nitride and modified diamond cantilever AFM tips were employed to determine the film hardness, friction coefficient, and elastic modulus. The hardness is found to be between 26 and 40 GPa by nanoindentation of the film with the diamond tip. The friction coefficient for the silicon nitride tip on the SiC film is about one third that for silicon nitride sliding on a silicon substrate. By combining nanoindentation and AFM measurements an elastic modulus of {approximately}300 GPa is estimated for these SiC films. In order to better understand the atomic scale mechanisms that determine the hardness and friction of SiC, we simulated the molecular dynamics of a diamond indenting a crystalline SiC substrate.

  3. Surface Brillouin scattering of cubic boron nitride films

    NASA Astrophysics Data System (ADS)

    Zinin, P.; Manghnani, M. H.; Zhang, X.; Feldermann, H.; Ronning, C.; Hofsäss, H.

    2002-04-01

    Surface Brillouin scattering has been used to determine the elastic properties of thin hard submicron cubic boron nitride (cBN) films grown on silicon by mass selected ion beam deposition. The elastic properties of the films have been determined by fitting experimental data to theoretical dispersion curves. A Green's function method was used to predict Brillouin scattering spectra of the acoustic excitation at the free surface. Our results demonstrate that the effect of the thin hexagonal boron nitride interlayer located between cBN film and the Si substrate on the velocity of the surface acoustic wave does not exceed 2% for a thin (16 nm) film and is negligible for cBN films thicker than 100 nm. The elastic properties of the cBN films are not softer than those of bulk cBN.

  4. Preparation of superhydrophobic nanodiamond and cubic boron nitride films

    SciTech Connect

    Zhou, Y. B.; Liu, W. M.; Wang, P. F.; Yang, Y.; Ye, Q.; He, B.; Pan, X. J.; Zhang, W. J.; Bello, I.; Lee, S. T.; Zou, Y. S.

    2010-09-27

    Superhydrophobic surfaces were achieved on the hardest and the second hardest materials, diamond and cubic boron nitride (cBN) films. Various surface nanostructures of nanocrystalline diamond (ND) and cBN films were constructed by carrying out bias-assisted reactive ion etching in hydrogen/argon plasmas; and it is shown that surface nanostructuring may enhance dramatically the hydrophobicity of ND and cBN films. Together with surface fluorination, superhydrophobic ND and cBN surfaces with a contact angle greater than 150 deg. and a sliding angle smaller than 10 deg. were demonstrated. The origin of hydrophobicity enhancement is discussed based on the Cassie model.

  5. Effect of Ge on SiC film morphology in SiC/Si films grown by MOCVD

    SciTech Connect

    Sarney, W.L.; Salamanca-Riba, L.; Zhou, P.; Spencer, M.G.; Taylor, C.; Sharma, R.P.; Jones, K.A.

    1999-07-01

    SiC/Si films generally contain stacking faults and amorphous regions near the interface. High quality SiC/Si films are especially difficult to obtain since the temperatures usually required to grow high quality SiC are above the Si melting point. The authors added Ge in the form of GeH{sub 2} to the reactant gases to promote two-dimensional CVD growth of SiC films on (111) Si substrates at 1,000 C. The films grown with no Ge are essentially amorphous with very small crystalline regions, whereas those films grown with GeH{sub 2} flow rates of 10 and 15 sccm are polycrystalline with the 3C structure. Increasing the flow rate to 20 sccm improves the crystallinity and induces growth of 6H SiC over an initial 3C layer. This study presents the first observation of spontaneous polytype transformation in SiC grown on Si by MOCVD.

  6. Quasi-Freestanding multilayer graphene films on the carbon face of SiC

    SciTech Connect

    Siegel, D. A.; Hwang, C. G.; Fedorov, A. V.; Lanzara, A.

    2010-06-30

    The electronic band structure of as-grown and doped graphene grown on the carbon face of SiC is studied by high-resolution angle-resolved photoemission spectroscopy, where we observe both rotations between adjacent layers and AB-stacking. The band structure of quasi-freestanding AB-bilayers is directly compared with bilayer graphene grown on the Si-face of SiC to study the impact of the substrate on the electronic properties of epitaxial graphene. Our results show that the C-face films are nearly freestanding from an electronic point of view, due to the rotations between graphene layers.

  7. Characterization Of Superconducting Samples With SIC System For Thin Film Developments: Status And Recent Results

    SciTech Connect

    Phillips, H. Lawrence; Reece, Charles E.; Valente-Feliciano, Anne-Marie; Xiao, Binping; Eremeev, Grigory V.

    2014-02-01

    Within any thin film development program directed towards SRF accelerating structures, there is a need for an RF characterization device that can provide information about RF properties of small samples. The current installation of the RF characterization device at Jefferson Lab is Surface Impedance Characterization (SIC) system. The data acquisition environment for the system has recently been improved to allow for automated measurement, and the system has been routinely used for characterization of bulk Nb, films of Nb on Cu, MgB{sub 2}, NbTiN, Nb{sub 3}Sn films, etc. We present some of the recent results that illustrate present capabilities and limitations of the system.

  8. Growth and interface phase stability of barium hexaferrite films on SiC(0001)

    SciTech Connect

    Lazarov, V. K.; Hasnip, P. J.; Cai, Z.; Ziemer, K. S.; Yoshida, K.

    2011-04-01

    We have studied interface phase stability of the BaFe{sub 12}O{sub 19} (BaM) thin films grown by molecular beam epitaxy on SiC(0001). The films were epitaxially grown with the following crystallographic relation: BaM(0001) parallel SiC(0001) and BaM(11-20) parallel SiC(11-20). High resolution TEM reveals the existence of two interfacial bands with different structure than BaM. The first band close to SiC is SiO{sub x} while the second has spinel structure and chemically corresponds to Fe{sub 3}O{sub 4}. These findings suggest that at initial growth stages Fe{sub 3}O{sub 4} is more favorable than BaM. Density functional theory modeling of the phase stability of BaM compared to Fe{sub 3}O{sub 4} shows that BaM is only stable at high oxygen partial pressures.

  9. Wetting behavior of low-index cubic SiC surfaces.

    PubMed

    Catellani, Alessandra; Cicero, Giancarlo; Galli, Giulia

    2006-01-14

    We report on the interaction of water molecules with polar and nonpolar stoichiometric surfaces of cubic silicon carbide, as described by ab initio molecular dynamics at finite temperature. Our calculations show that, irrespective of coverage, in the gas phase water spontaneously dissociates on both polar Si-terminated (001) and nonpolar (110) surfaces, following similar mechanisms. The specific geometric arrangement of atoms on the outermost surface layer is responsible for water orientation and coordination and thus plays a major role in determining surface reactivity. This is found to be the case also for water on a computer-generated amorphous-SiC surface. In addition, from a macroscopic standpoint, the ability of the two crystalline surfaces with different polarities to induce water dissociation can be related to the similarities of their ionization potentials. PMID:16422626

  10. Effect of SiC interlayer between Ti6Al4V alloy and hydroxyapatite films.

    PubMed

    Azem, Funda Ak; Birlik, Isil; Braic, Viorel; Toparli, Mustafa; Celik, Erdal; Parau, Anca; Kiss, Adrian; Titorencu, Irina; Vladescu, Alina

    2015-04-01

    Bioactive coatings are frequently used to improve the osseointegration of the metallic implants used in dentistry or orthopaedics. Among different types of bioactive coatings, hydroxyapatite (Ca10(PO4)6(OH)2) is one of the most extensively used due to its chemical similarities to the components of bones and teeth. In this article, production and characterization of hydroxyapatite films deposited on Ti6Al4V alloy prepared by magnetron sputtering were reported. Besides, SiC was deposited on substrate surface to study the interlayer effect. Obtained coatings were annealed at 600 °C for 30 and 120 min in a mixed atmosphere of N2 + H2O vapours with the heating rate of 12 °C min(-1). The effects of SiC interlayer and heat treatment parameters on the structural, mechanical and corrosion properties were investigated. After heat treatment process, the crystalline hydroxyapatite was obtained. Additionally, cell viability tests were performed. The results show that the presence of the SiC interlayer contributes a decrease in surface roughness and improves the mechanical properties and corrosion performance of the hydroxyapatite coatings. Biological properties were not affected by the presence of the SiC interlayer. PMID:25934259

  11. Mechanical properties of pulsed laser deposited nanocrystalline SiC films

    NASA Astrophysics Data System (ADS)

    Craciun, D.; Socol, G.; Cristea, D. V.; Stoicanescu, M.; Olah, N.; Balazs, K.; Stefan, N.; Lambers, E.; Craciun, V.

    2015-05-01

    The mechanical properties of nanocrystalline SiC thin films grown on (100) Si at a substrate temperature of 1000 °C under a CH4 atmosphere using the pulsed laser deposition (PLD) technique were investigated. Nanoindentation results showed that films exhibited hardness values around 36 GPa and Young modulus values around 250 GPa. Scratch tests found that films were adherent to the substrate, with critical load values similar to those recorded for other hard coatings deposited on significantly softer Si substrates. Wear tests performed at a temperature of 900 °C showed that films exhibited friction coefficients and wear rates very similar to those measured at room temperature, due to the presence of C-C bonds as evidenced by X-ray photoelectron spectroscopy investigations. These results recommend such coatings for demanding high temperature applications such as nuclear fuel encapsulation.

  12. Preparation of films of a highly aligned lipid cubic phase.

    PubMed

    Squires, Adam M; Hallett, James E; Beddoes, Charlotte M; Plivelic, Tomás S; Seddon, Annela M

    2013-02-12

    We demonstrate a method by which we can produce an oriented film of an inverse bicontinuous cubic phase (Q(II)(D)) formed by the lipid monoolein (MO). By starting with the lipid as a disordered precursor (the L(3) phase) in the presence of butanediol, we can obtain a film of the Q(II)(D) phase showing a high degree of in-plane orientation by controlled dilution of the sample under shear within a linear flow cell. We demonstrate that the direction of orientation of the film is different from that found in the oriented bulk material that we have reported previously; therefore, we can now reproducibly form Q(II)(D) samples oriented with either the [110] or the [100] axis aligned in the flow direction depending on the method of preparation. The deposition of MO as a film, via a moving fluid-air interface that leaves a coating of MO in the L(3) phase on the capillary wall, leads to a sample in the [110] orientation. This contrasts with the bulk material that we have previously demonstrated to be oriented in the [100] direction, arising from flow producing an oriented bulk slug of material within the capillary tube. The bulk sample contains significant amounts of residual butanediol, which can be estimated from the lattice parameter of the Q(II)(D) phase obtained. The sample orientation and lattice parameters are determined from synchrotron small-angle X-ray scattering patterns and confirmed by simulations. This has potential applications in the production of template materials and the growth of protein crystals for crystallography as well as deepening our understanding of the mechanisms underlying the behavior of lyotropic liquid-crystal phases. PMID:23347289

  13. Enhanced electroactive properties of polyurethane films loaded with carbon-coated SiC nanowires

    NASA Astrophysics Data System (ADS)

    Guiffard, B.; Guyomar, D.; Seveyrat, L.; Chowanek, Y.; Bechelany, M.; Cornu, D.; Miele, P.

    2009-03-01

    Polyurethane-based nanocomposite films were prepared by incorporating carbon-coated SiC nanowires (SiC@C) into the polymer matrix. Electric field-induced strain measurements revealed that a loading of 0.5 wt% SiC@C increased the strain level by a factor of 1.7 at a moderate field strength (6.5 V µm-1). Current-electric field characteristics and the film thickness dependence of strain demonstrated that the improvement of the electromechanical response was linked to a more pronounced space charge effect in the nanocomposite than in the polymer host. DSC measurements revealed that the level of phase mixing in the PU matrix remained unchanged after SiC@C filling; hence, the nano-objects themselves acted as charge traps.

  14. First principles-based multiparadigm, multiscale strategy for simulating complex materials processes with applications to amorphous SiC films

    SciTech Connect

    Naserifar, Saber; Goddard, William A.; Tsotsis, Theodore T.; Sahimi, Muhammad

    2015-05-07

    Progress has recently been made in developing reactive force fields to describe chemical reactions in systems too large for quantum mechanical (QM) methods. In particular, ReaxFF, a force field with parameters that are obtained solely from fitting QM reaction data, has been used to predict structures and properties of many materials. Important applications require, however, determination of the final structures produced by such complex processes as chemical vapor deposition, atomic layer deposition, and formation of ceramic films by pyrolysis of polymers. This requires the force field to properly describe the formation of other products of the process, in addition to yielding the final structure of the material. We describe a strategy for accomplishing this and present an example of its use for forming amorphous SiC films that have a wide variety of applications. Extensive reactive molecular dynamics (MD) simulations have been carried out to simulate the pyrolysis of hydridopolycarbosilane. The reaction products all agree with the experimental data. After removing the reaction products, the system is cooled down to room temperature at which it produces amorphous SiC film, for which the computed radial distribution function, x-ray diffraction pattern, and the equation of state describing the three main SiC polytypes agree with the data and with the QM calculations. Extensive MD simulations have also been carried out to compute other structural properties, as well the effective diffusivities of light gases in the amorphous SiC film.

  15. Theory and practice of SiC growth on Si and its applications to wide-gap semiconductor films

    NASA Astrophysics Data System (ADS)

    Kukushkin, S. A.; Osipov, A. V.

    2014-08-01

    The recent advances in epitaxial SiC films' growth on Si are overviewed. The basic classical methods currently used for SiC films' growth are discussed and their advantages and disadvantages are explored. The basic idea and the theoretical background for a new method of the synthesis of epitaxial SiC films on Si are given. It will be shown that the new method is significantly different from the classical techniques of thin-film growth where the evaporation of the atoms onto the substrate surface is exploited. The new method is based on the substitution of some atoms in the silicon matrix by the carbon atoms to form the molecules of silicon carbide. It will be shown that the following process of SiC nucleation happens gradually without destroying the crystalline structure of the silicon matrix, and the orientation of a grown film is imposed by the original crystalline structure of the silicon matrix (not only by the substrate surface as in conventional methods of film growth). A comparison of the new method with other epitaxy techniques will be given. The new method of solid-phase epitaxy based on the substitution of atoms and on the creation of dilatation dipoles solves one of the major problems in heteroepitaxy. It provides the synthesis of low-defective unstrained epitaxial films with a large difference between the lattice parameters of the film and the substrate without using any additional buffer layers. This method has another unique feature distinguishing it from the classical techniques of SiC films' growth—it allows the growing of SiC films of hexagonal polytypes. A new kind of phase transformation in solids owing to the chemical transformation of one substance into another will be described theoretically and revealed experimentally. This type of phase transformation, and the mechanism of a broad class of heterogeneous chemical reactions between gas and solid phases, will be illustrated by an example of the growth of SiC epitaxial layers due to the

  16. Microstructure investigation of SiC films synthesized from liquid phase in Sm-Co melts

    NASA Astrophysics Data System (ADS)

    Lee, Pei-Ting; Nayak, Pramoda K.; Wang, Sheng-Chang; Sung, James C.; Huang, Jow-Lay

    2011-12-01

    Silicon carbide layers were grown on a Si substrate at a temperature below 1100 °C and pressure of 10 5 Pa. The synthesis was carried out in a tube furnace through cyclic heating process using methane as a carbon source and Sm-Co mixed powder as a solvent. The growth of SiC from rare earth Sm-based solvent is an innovative approach, and Co can promote the formation of solvent during the growth process. The structural and compositional analyses were carried out using X-ray diffraction, electron probe micro-analyzer, scanning electron microscopy and transmission electron microscopy. Results indicated that β-SiC was successfully fabricated on Si (1 1 1) substrate. The heterogeneous nucleation of β-SiC was found to be observed initially at the edge of triangle-shaped sites on Si (1 1 1) surface that formed due to the existence of Co, and then grew and expanded to form β-SiC film. The growth process of SiC via vapour-liquid-solid mechanism was also discussed in this study.

  17. 'Buffer-layer' technique for the growth of single crystal SiC on Si

    NASA Astrophysics Data System (ADS)

    Addamiano, A.; Sprague, J. A.

    1984-03-01

    The nature of the buffer layers needed for the single-crystal deposition of cubic SiC on Si substrates has been studied. The preparation of chemically formed surface layers of SiC on (100) Si wafers is described. The reaction-grown films of SiC were examined by reflection high-energy electron diffraction using an incident electron energy of 200 keV and by SEM using incident electron energies of 20 and 200 keV. It is concluded that the buffer layer obtained at about 1400 C is a stressed monocrystalline layer of cubic SiC whose crystals contain considerable imperfections. The stresses are due to quenching to room temperature because of the large difference between the thermal expansion coefficients of Si and SiC.

  18. Raman spectroscopy study of SiC thin films prepared by PECVD for solar cell working in hard environment

    NASA Astrophysics Data System (ADS)

    Sasinková, Vlasta; Huran, Jozef; Kleinová, Angela; Boháček, Pavol; Arbet, Juraj; Sekáčova, Mária

    2015-09-01

    Amorphous silicon carbide films were deposited by plasma enhanced chemical vapor deposition (PECVD) technology using SiH4, CH4, H2 and NH3 gas as precursors. The concentration of elements in the films was determined by RBS and ERD analytical method. Chemical compositions were analyzed by FT-IR spectroscopy. Raman spectroscopy study of the SiC films were performed by using a Raman microscope. Irradiation of samples with neutrons to fluencies A(7.9x1014 cm-2), B(5x1015 cm-2) and C(3.4x1016 cm-2) was performed at room temperature. Raman spectroscopy results of SiC films showed decreasing of Raman band feature intensity after neutron irradiation and slightly decreased with increased neutron fluencies. Raman spectra differences between types of films before and after neutron irradiation are discussed. The electrical properties of SiC films were determined by the I-V measurement at 295 K. The measured currents were greater (about two order) after irradiation than the current before irradiation for all samples and rose up with neutron fluencies.

  19. Suppression of UV photoluminescence in sandwich-structured Si/C composite films

    NASA Astrophysics Data System (ADS)

    Zhu, Y.; Yuan, C. L.; Liu, R.; Ong, P. P.

    2002-10-01

    Thin films of composite silicon/carbon (Si/C) were prepared by pulsed-laser ablation alternately on C and Si materials on a rotary target, followed by vacuum deposition of the ablated materials on an ultra-clean glass substrate. The film structure consisted of alternate nanolayers of Si nanocrystals and amorphous C, with a fairly sharp demarcation boundary between adjacent layers forming well-defined sandwich structures. At room temperature, this composite nanolayered structure was found to yield much lower photoluminescent (PL) emission in the ultra violet region (300 390 nm) in comparison with that obtained for pure Si or for Si/Al2O3 thin films (see Zhu Y., Wang H. and Ong P. P. J. Phys. D, 33 (2000) 1965, and Zhu Y. and Ong P. P. J. Phys. Condens. Matter, 13 (2001) L1). The suppression mechanism of the UV PL emission appeared to occur in the interfacial surfaces between adjacent crystalline Si and amorphous C layers. It provides a possible way to selectively filter out the usually undesirable UV component of the PL emission from the silicon nanoparticles.

  20. Ambient condition laser writing of graphene structures on polycrystalline SiC thin film deposited on Si wafer

    SciTech Connect

    Yue, Naili; Zhang, Yong; Tsu, Raphael

    2013-02-18

    We report laser induced local conversion of polycrystalline SiC thin-films grown on Si wafers into multi-layer graphene, a process compatible with the Si based microelectronic technologies. The conversion can be achieved using a 532 nm CW laser with as little as 10 mW power, yielding {approx}1 {mu}m graphene discs without any mask. The conversion conditions are found to vary with the crystallinity of the film. More interestingly, the internal structure of the graphene disc, probed by Raman imaging, can be tuned with varying the film and illumination parameters, resembling either the fundamental or doughnut mode of a laser beam.

  1. Low energy radiation stability of nano-crystalline cubic Zirconia films

    NASA Astrophysics Data System (ADS)

    Kalita, Parswajit; Ghosh, Santanu; Avasthi, Devesh K.

    2016-07-01

    The radiation stability of nano-crystalline cubic Zirconia films was investigated under 41 keV He ion irradiation. These ions were chosen to simulate alpha particles (produced during fission events) because of the similar electronic energy loss in Zirconia. The ZrO2 films, with an average grain size of 8 nm, were grown on Si (1 0 0) substrates by electron beam assisted thermal evaporation. Although the cubic structure was retained upon irradiation, a slight reduction in crystallinity in the irradiated films was detected as compared to the as-deposited film. No bulk amorphization was however observed for any of the fluences and hence these films are radiation tolerant to alpha particles.

  2. Structural analysis of cubic boron nitride films by ultraviolet Raman spectroscopy

    SciTech Connect

    Leung, K.M.; Li, H.Q.; Zou, Y.S.; Ma, K.L.; Chong, Y.M.; Ye, Q.; Zhang, W.J.; Lee, S.T.; Bello, I.

    2006-06-12

    Cubic boron nitride (BN) films with improved crystallinity are deposited by physical vapor deposition at an extremely low substrate bias (-35 V). The films are characterized by UV Raman in association with Fourier transformed infrared (FTIR) spectroscopy. The influences of bias voltage and film thickness on the characterizations are investigated. UV Raman, in contrast to FTIR, is demonstrated to be a more powerful tool with high sensitivity for quantitative and/or qualitative evaluation of the phase purity and crystallinity, especially as the film thickness increases. Hexagonal BN inclusions (less than 1%), not evident in FTIR, are clearly revealed by UV Raman analysis.

  3. A probabilistic model of the electron transport in films of nanocrystals arranged in a cubic lattice

    NASA Astrophysics Data System (ADS)

    Kriegel, Ilka; Scotognella, Francesco

    2016-08-01

    The fabrication of nanocrystal (NC) films, starting from colloidal dispersion, is a very attractive topic in condensed matter physics community. NC films can be employed for transistors, light emitting diodes, laser, and solar cells. For this reason the understanding of the film conductivity is of major importance. In this paper we describe a probabilistic model that allow to predict the conductivity of the NC films, in this case of a cubic lattice of Lead Selenide NCs. The model is based on the hopping probability between NCs show a comparison with experimental data reported in literature.

  4. Effects of ambient conditions on the adhesion of cubic boron nitride films on silicon substrates

    SciTech Connect

    Cardinale, G.F.; Howitt, D.G.; Mirkarimi, P.B.; McCarty, K.F.; Klaus, E.J.; Medlin, D.L.

    1994-08-01

    Effect of environmental conditions on cubic boron nitride (cBN) film adhesion to silicon substrates was studied. cBN films were deposited onto (100)-oriented silicon substrates by ion-assisted pulsed laser deposition. Irradiating ions were mixtures of nitrogen with argon, krypton, and xenon. Under room-ambient conditions, the films delaminated in the following time order: N/Xe, N/Kr, and N/Ar. cBN films deposited using N/Xe ion-assisted deposition were exposed to four environmental conditions for several weeks: a 1-mTorr vacuum, high humidity, dry oxygen, and dry nitrogen. Films exposed to the humid environment delaminated whereas those stored under vacuum or in dry gases did not. Films stored in dry nitrogen were removed after nearly two weeks and placed in the high-humidity chamber; these films subsequently delaminated within 14 hours.

  5. Research on the piezoelectric response of cubic and hexagonal boron nitride films

    NASA Astrophysics Data System (ADS)

    Chen, Xi-ming; Sun, Lian-jie; Yang, Bao-he; Guo, Yan; Wu, Xiaoguo

    2012-03-01

    Boron nitride (BN) films for high-frequency surface acoustic wave (SAW) devices are deposited on Ti/Al/Si(111) wafers by radio frequency (RF) magnetron sputtering. The structure of BN films is investigated by Fourier transform infrared (FTIR) spectroscopy and X-ray diffraction (XRD) spectra, and the surface morphology and piezoelectric properties of BN films are characterized by atomic force microscopy (AFM). The results show that when the flow ratio of nitrogen and argon is 2:18, the cubic BN (c-BN) film is deposited with high purity and c-axis orientation, and when the flow ratio of nitrogen and argon is 4:20, the hexagonal BN (h-BN) film is deposited with high c-axis orientation. Both particles are uniform and compact, and the roughnesses are 1.5 nm and 2.29 nm, respectively. The h-BN films have better piezoelectric response and distribution than the c-BN films.

  6. Chemical vapour deposition of undoped and spinel-doped cubic zirconia film using organometallic process

    NASA Astrophysics Data System (ADS)

    Takahashi, Yasutaka; Kawae, Takayuki; Nasu, Mineji

    1986-03-01

    Growth of undoped and spinel-doped ZrO 2 films on glass substrates by the vapour phase decomposition of zirconium t-butoxide (ZTB) was investigated. Undoped tetragonal and monoclinic ZrO 2 films were formed below and above 400°C, respectively. Cubic ZrO 2 films were grown when the ZrO 2 was doped with more than 5 mol% of spinel MgAl 2O 4. Magnesium aluminium isopropoxide MgAl 2 (O-i-Pr) 8 (MAI) was used as the dopant source of the spinel. The cubic films have a higher Vickers hardness than the monoclinic films by about 200-250 kg/mm 2, and are stable up to 800°C, above which they were transformed to the monoclinic phase. This is in contrast to the higher temperature stability of the spinel-doped zirconia powder with spinel content 6 mol% formed by hydrolysis of a isopropanol solution of mixed zirconium n-butoxide and MAI, where the tetragonal form of ZrO 2 was kept unchanged by annealing it up to about 1000°C. The difference is attributed to effect of surface energy control in the tetragonal powders which is absent in the cubic films produced by CVD.

  7. Structure and Luminescence Properties of Eu3+-Doped Cubic Mesoporous Silica Thin Films

    PubMed Central

    2010-01-01

    Eu3+ ions-doped cubic mesoporous silica thin films with a thickness of about 205 nm were prepared on silicon and glass substrates using triblock copolymer as a structure-directing agent using sol–gel spin-coating and calcination processes. X-ray diffraction and transmission electron microscopy analysis show that the mesoporous silica thin films have a highly ordered body-centered cubic mesoporous structure. High Eu3+ ion loading and high temperature calcination do not destroy the ordered cubic mesoporous structure of the mesoporous silica thin films. Photoluminescence spectra show two characteristic emission peaks corresponding to the transitions of5D0-7F1 and 5D0-7F2 of Eu3+ ions located in low symmetry sites in mesoporous silica thin films. With the Eu/Si molar ratio increasing to 3.41%, the luminescence intensity of the Eu3+ ions-doped mesoporous silica thin films increases linearly with increasing Eu3+ concentration. PMID:20672132

  8. Cluster-assembled cubic zirconia films with tunable and stable nanoscale morphology against thermal annealing

    NASA Astrophysics Data System (ADS)

    Borghi, F.; Sogne, E.; Lenardi, C.; Podestà, A.; Merlini, M.; Ducati, C.; Milani, P.

    2016-08-01

    Nanostructured zirconium dioxide (zirconia) films are very promising for catalysis and biotechnological applications: a precise control of the interfacial properties of the material at different length scales and, in particular, at the nanoscale, is therefore necessary. Here, we present the characterization of cluster-assembled zirconia films produced by supersonic cluster beam deposition possessing cubic structure at room temperature and controlled nanoscale morphology. We characterized the effect of thermal annealing in reducing and oxidizing conditions on the crystalline structure, grain dimensions, and topography. We highlight the mechanisms of film growth and phase transitions, which determine the observed interfacial morphological properties and their resilience against thermal treatments.

  9. High-quality, faceted cubic boron nitride films grown by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Zhang, W. J.; Jiang, X.; Matsumoto, S.

    2001-12-01

    Thick cubic boron nitride (cBN) films showing clear crystal facets were achieved by chemical vapor deposition. The films show the highest crystallinity of cBN films ever achieved from gas phase. Clear evidence for the growth via a chemical route is obtained. A growth mechanism is suggested, in which fluorine preferentially etches hBN and stabilizes the cBN surface. Ion bombardment of proper energy activates the cBN surface bonded with fluorine so as to enhance the bonding probability of nitrogen-containing species on the F-stabilized B (111) surface.

  10. Epitaxial metallic β-Nb2N films grown by MBE on hexagonal SiC substrates

    NASA Astrophysics Data System (ADS)

    Katzer, D. Scott; Nepal, Neeraj; Meyer, David J.; Downey, Brian P.; Wheeler, Virginia D.; Storm, David F.; Hardy, Matthew T.

    2015-08-01

    RF-plasma MBE was used to epitaxially grow 4- to 100-nm-thick metallic β-Nb2N thin films on hexagonal SiC substrates. When the N/Nb flux ratios are greater than one, the most critical parameter for high-quality β-Nb2N is the substrate temperature. The X-ray characterization of films grown between 775 and 850 °C demonstrates β-Nb2N phase formation. The (0002) and (21\\bar{3}1) X-ray diffraction measurements of a β-Nb2N film grown at 850 °C reveal a 0.68% lattice mismatch to the 6H-SiC substrate. This suggests that β-Nb2N can be used for high-quality metal/semiconductor heterostructures that cannot be fabricated at present.

  11. The synthesis, characterization, and mechanical properties of thick, ultrahard cubic boron nitride films deposited by ion-assisted sputtering

    SciTech Connect

    Mirkarimi, P.B.; Medlin, D.L.; McCarty, K.F.; Dibble, D.C.; Clift, W.M.; Knapp, J.A.; Barbour, J.C.

    1997-08-01

    Significant ion irradiation is needed during growth to synthesize cubic boron nitride (cBN) films. This results in large film stresses, which have limited cBN film thicknesses to only a few hundred nm and represents a significant barrier in the development of cBN film technology. Using a new hybrid deposition technique, we have synthesized cubic BN films up to 700 nm (0.7 {mu}m) thick. A compositional and structural analysis of the films using several standard characterization techniques confirms that relatively thick polycrystalline films with a high cBN content were synthesized. Thicker cBN films enable hardness measurements to be undertaken without major substrate effects. Nanoindentation measurements yield hardness values for the cubic BN films up to 60{endash}70 GPa, which are greater than values measured for bulk cBN. The measured elastic modulus was observed to be lower than the bulk, and this can be accounted for by an elastic deformation of the silicon substrate. The mechanical properties of the cubic BN films are discussed with reference to other ultrahard thin films such as diamond and diamondlike carbon. {copyright} {ital 1997 American Institute of Physics.}

  12. The electrical properties of sulfur-implanted cubic boron nitride thin films

    NASA Astrophysics Data System (ADS)

    Deng, Jin-Xiang; Qin, Yang; Kong, Le; Yang, Xue-Liang; Li, Ting; Zhao, Wei-Ping; Yang, Ping

    2012-04-01

    Cubic boron nitride (c-BN) thin films are deposited on p-type Si wafers using radio frequency (RF) sputtering and then doped by implanting S ions. The implantation energy of the ions is 19 keV, and the implantation dose is between 1015 ions/cm2 and 1016 ions/cm2. The doped c-BN thin films are then annealed at a temperature between 400 °C and 800 °C. The results show that the surface resistivity of doped and annealed c-BN thin films is lowered by two to three orders, and the activation energy of c-BN thin films is 0.18 eV.

  13. CO Oxidation Prefers the Eley-Rideal or Langmuir-Hinshelwood Pathway: Monolayer vs Thin Film of SiC.

    PubMed

    Sinthika, S; Vala, Surya Teja; Kawazoe, Y; Thapa, Ranjit

    2016-03-01

    Using the first-principles approach, we investigated the electronic and chemical properties of wurtzite silicon carbide (2H-SiC) monolayer and thin film structures and substantiated their catalytic activity toward CO oxidation. 2H-SiC monolayer, being planar, is quite stable and has moderate binding with O2, while CO interacts physically; thus, the Eley-Rideal (ER) mechanism prevails over the Langmuir-Hinshelwood (LH) mechanism with an easily cleared activation barrier. Contrarily, 2H-SiC thin film, which exhibits a nonplanar structure, allows moderate binding of both CO and O2 on its surface, thus favoring the LH mechanism over the ER one. Comprehending these results leads to a better understanding of the reaction mechanisms involving structural contrast. Weak overlapping between the 2p(z)(C) and 3p(z)(Si) orbitals of the SiC monolayer system has been found to be the primary reason to revert the active site toward sp(3) hybridization, during interaction with the molecules. In addition, the influences of graphite and Ag(111) substrates on the CO oxidation mechanism were also studied, and it is observed that the ER mechanism is preserved on SiC/G system, while CO oxidation on the SiC/Ag(111) system follows the LH mechanism. The calculated Sabatier activities of the SiC catalysts show that the catalysts are very efficient in catalyzing CO oxidation. PMID:26866799

  14. Role of polytypism and degree of hexagonality on the photoinduced optical second harmonic generation in SiC nanocrystalline films

    NASA Astrophysics Data System (ADS)

    Semenov, A.; Puziko, V.; Skorik, S.; Wojciechowski, A.; Fedorchuk, A. O.; Maciąg, A.

    2015-05-01

    Photoinduced optiсal second harmonic generation was studied in nanocrystalline SiC films prepared by the method of direct ion deposition. For the studies were chosen three types of polytypes (with different degree of hexagonality) - 24R with degree hexagonality G=25, 27R-G=44, 33R with - G=36. The bicolor photoinduced treatment was performed by the wavelengths 1064nm/532 nm by 15 ns YAG:Nd laser. The efficiency of the output SHG was evaluated by ratio of the corresponding signal intensities with respect to the references and by the time delay between the SHG and the fundamental maxima. Explanation of the observed effect is given within a framework of the occurrence of the nano-trapping levels in the film crystalline interfaces.

  15. Preparation of cubic boron nitride thin film by the helicon wave plasma enhanced chemical vapor deposition

    SciTech Connect

    Kim, S.; Kim, I.; Kim, K.

    1996-12-01

    Cubic boron nitride ({ital c}-BN) film was deposited on Si(100) substrate using the chemical vapor deposition process assisted by high density plasma of Helicon wave with Borazine (B{sub 3}N{sub 3}H{sub 6}) precursor. It was found that the bombardment of ions with high flux and energy onto the film was necessarily required for synthesizing a {ital c}-BN film. Increasing a negative rf bias on the substrate increased the formation fraction of {ital c}-BN in the film. A nearly pure {ital c}-BN phase was synthesized at the conditions of plasma density in the reactor and rf substrate bias, above 10{sup 11} cm{sup {minus}3} and {minus}350 V, respectively. The phase identification of BN film was carried out by the transmission electron microscopy as well as Fourier transformed infrared spectroscopy. The infrared spectra for {ital c}-BN film synthesized at the rf bias of {minus}350 V appeared at 1093 cm{sup {minus}1} with a strong single peak, which is close to a value for the characteristic vibration mode of bulk {ital c}-BN (1065 cm{sup {minus}1}). The {ital c}-BN in the film was also confirmed and found to be a fine poly-crystalline with the grain sizes ranging from 200 to 400 A. {copyright} {ital 1996 American Institute of Physics.}

  16. "Un-annealed and Annealed Pd Ultra-Thin Film on SiC Characterized by Scanning Probe Microscopy and X-ray Photoelectron Spectroscopy"

    NASA Technical Reports Server (NTRS)

    Lu, W. J.; Shi, D. T.; Elshot, K.; Bryant, E.; Lafate, K.; Chen, H.; Burger, A.; Collins, W. E.

    1998-01-01

    Pd/SiC has been used as a hydrogen and a hydrocarbon gas sensor operated at high temperature. UHV (Ultra High Vacuum)-Scanning Tunneling Microscopy (STM), Atomic Force Microscopy (AFM) and X-ray Photoelectron Spectroscopy (XPS) techniques were applied to study the relationship between the morphology and chemical compositions for Pd ultra-thin films on SiC (less than 30 angstroms) at different annealing temperatures. Pd ultra-thin film on 6H-SiC was prepared by the RF sputtering method. The morphology from UHV-STM and AFM shows that the Pd thin film was well deposited on SiC substrate, and the Pd was partially aggregated to round shaped participates at an annealing temperature of 300 C. At 400 C, the amount of surface participates decreases, and some strap shape participates appear. From XPS, Pd2Si was formed on the surface after annealing at 300 C, and all Pd reacted with SiC to form Pd2Si after annealing at 400 C. The intensity of the XPS Pd peak decreases enormously at 400 C. The Pd film diffused into SiC, and the Schottky barrier height has almost no changes. The work shows the Pd sicilides/SiC have the same electronic properties with Pd/SiC, and explains why the Pd/SiC sensor still responds to hydrogen at high operating temperatures.

  17. Low-temperature synthesis of homogeneous nanocrystalline cubic silicon carbide films

    SciTech Connect

    Cheng Qijin; Xu, S.

    2007-09-01

    Silicon carbide films are fabricated by inductively coupled plasma chemical vapor deposition from feedstock gases silane and methane heavily diluted with hydrogen at a low substrate temperature of 300 deg. C. Fourier transform infrared absorption spectroscopy, Raman spectroscopy, x-ray photoelectron spectroscopy, and high-resolution transmission electron microscopy analyses show that homogeneous nanocrystalline cubic silicon carbide (3C-SiC) films can be synthesized at an appropriate silane fraction X[100%xsilane flow(SCCM)/silane+methane flow(SCCM)] in the gas mixture. The achievement of homogeneous nanocrystalline 3C-SiC films at a low substrate temperature of 300 deg. C is a synergy of a low deposition pressure (22 mTorr), high inductive rf power (2000 W), heavy dilution of feedstock gases silane and methane with hydrogen, and appropriate silane fractions X (X{<=}33%) in the gas mixture employed in our experiments.

  18. Synthesis of cubic boron nitride films with mean ion energies of a few eV

    SciTech Connect

    Teii, Kungen; Yamao, Ryota; Yamamura, Toshifumi; Matsumoto, Seiichiro

    2007-02-01

    The lowest threshold energy of ion bombardment for cubic boron nitride (cBN) film deposition is presented. cBN films are prepared on positively biased Si (100) substrates from boron trifluoride (BF{sub 3}) gas in the high-density source region of an inductively coupled plasma with mean ion impact energies from 45 down to a few eV or less. The great decrease in the threshold ion energy is mainly attributed to specific chemical effects of fluorine as well as high ion-to-boron flux ratios. The results show evidence for the existence of a way to deposit cBN films through quasistatic chemical processes under ultralow-energy ion impact.

  19. Electrochemical properties and applications of nanocrystalline, microcrystalline, and epitaxial cubic silicon carbide films.

    PubMed

    Zhuang, Hao; Yang, Nianjun; Zhang, Lei; Fuchs, Regina; Jiang, Xin

    2015-05-27

    Microstructures of the materials (e.g., crystallinitiy, defects, and composition, etc.) determine their properties, which eventually lead to their diverse applications. In this contribution, the properties, especially the electrochemical properties, of cubic silicon carbide (3C-SiC) films have been engineered by controlling their microstructures. By manipulating the deposition conditions, nanocrystalline, microcrystalline and epitaxial (001) 3C-SiC films are obtained with varied properties. The epitaxial 3C-SiC film presents the lowest double-layer capacitance and the highest reversibility of redox probes, because of its perfect (001) orientation and high phase purity. The highest double-layer capacitance and the lowest reversibility of redox probes have been realized on the nanocrystalline 3C-SiC film. Those are ascribed to its high amount of grain boundaries, amorphous phases and large diversity in its crystal size. Based on their diverse properties, the electrochemical performances of 3C-SiC films are evaluated in two kinds of potential applications, namely an electrochemical capacitor using a nanocrystalline film and an electrochemical dopamine sensor using the epitaxial 3C-SiC film. The nanocrystalline 3C-SiC film shows not only a high double layer capacitance (43-70 μF/cm(2)) but also a long-term stability of its capacitance. The epitaxial 3C-SiC film shows a low detection limit toward dopamine, which is one to 2 orders of magnitude lower than its normal concentration in tissue. Therefore, 3C-SiC film is a novel but designable material for different emerging electrochemical applications such as energy storage, biomedical/chemical sensors, environmental pollutant detectors, and so on. PMID:25939808

  20. Influence of sputtering power on structural, mechanical and photoluminescence properties of nanocrystalline SiC thin films

    NASA Astrophysics Data System (ADS)

    Singh, Narendra; Kaur, Davinder

    2016-05-01

    In the present study, SiC thin films were deposited on Si (100) substrate by magnetron sputtering using a 4N purity commercial SiC target in argon atmosphere. The effect of sputtering RF power (140-170W) on structural, mechanical and photoluminescence properties were systematically studied by X-ray diffraction, field emission scanning electron microscopy, Nanoindentation and Spectrophotometer respectively. X-ray diffraction shows polycrystalline 4H-SiC phase with (105) preferred orientation and an enhancement in crystallite size with increasing power was also observed. The decrement in hardness and Young's modulus with increment in RF power was ascribed to Hall-Petch relation. The maximum hardness and Young's modulus were found to be 32 GPa and 232 GPa respectively. The photoluminescence spectra show peaks at 384 nm (3.22 eV) which corresponds to bandgap of 4H-SiC (phonon assisted band to band recombination) and 416 nm (2.99 eV) may be attributed to defect states and intensity of both peaks decreases as power increases.

  1. Semiconducting properties of zinc-doped cubic boron nitride thin films

    SciTech Connect

    Nose, K.; Yoshida, T.

    2007-09-15

    We have examined the electronic properties of zinc-doped cubic boron nitride (cBN) thin films prepared by sputter deposition. The electric conductivity of films deposited in pure Ar increased as the concentration of zinc dopant increased, and hole conduction was identified by the measurement of thermoelectric currents. It was also found that the conductivity increment in such films was accompanied by a linear increase in the B/(B+N) ratio. At the same time, no modification of the composition and the conductivity by incorporated zinc was observed when film growth took place in presence of nitrogen gas. The effect of the excess boron on the conductivity emerged only when films show semi-insulating behavior. These results suggest that Zn substitution for nitrogen causes high electric conductivity of cBN. The electric contact between Ti electrode and semiconducting cBN was examined by the transfer length method, and Ohmic conduction was observed in the Ti/cBN contact. The specific contact resistance was affected by the specific resistance of cBN films, and it was reduced from 10{sup 5} to 100 {omega} cm{sup 2} by increasing the concentration of incorporated Zn.

  2. Design of Twin Structures in SiC Nanowires

    SciTech Connect

    Yongfeng Zhang; Hanchen Huang

    2012-11-01

    With covalent bonding, SiC has high mechanical strength and a large energy gap in electronic band structure. Nanoscale SiC, in the form of nanowires, has increased mechanical toughness and variable band gaps. Further, introduction of twin boundaries into cubic SiC nanowires can result in improvement in both mechanical and electronic properties. This review presents effects of twin boundaries on properties of cubic SiC nanowires, including mechanical and electronic properties. Further, this review presents recent developments in introducing twin boundaries into cubic SiC nanowires, controllably and uncontrollably.

  3. Low-energy mass-selected ion beam production of fragments produced from hexamethyldisilane for SiC film formation

    NASA Astrophysics Data System (ADS)

    Yoshimura, Satoru; Sugimoto, Satoshi; Kiuchi, Masato

    2016-03-01

    We have proposed an experimental methodology which makes it possible to deposit silicon carbide (SiC) films on Si substrates with a low-energy mass-selected ion beam system using hexamethyldisilane (HMD) as a gas source. In this study, one of the fragment ions produced from HMD, SiCH4+, was mass-selected. The ion energy was approximately 100 eV. Then, the SiCH4+ ions were irradiated to a Si(100) substrate. When the temperature of the Si substrate was set at 800 °C during the ion irradiation, the X-ray diffraction and Raman spectroscopy of the substrate following the completion of ion irradiation experiment demonstrated the occurrence of 3C-SiC deposition.

  4. Molecular dynamics simulation of delamination of a stiff, body-centered-cubic crystalline film from a compliant Si substrate

    NASA Astrophysics Data System (ADS)

    Hale, L. M.; Zhou, X. W.; Zimmerman, J. A.; Moody, N. R.; Ballarini, R.; Gerberich, W. W.

    2009-10-01

    Compliant substrate technology offers an effective approach to grow high-quality multilayered films, of importance to microelectronics and microelectromechanical systems devices. By using a thin, soft substrate to relieve the mismatch strain of an epitaxial film, the critical thickness of misfit dislocation formation in the overlayer is effectively increased. Experiments have indicated that stiff films deposited onto Si substrates can delaminate at the interface. However, the atomic mechanisms of the deformation and the fracture of the films have not been well studied. Here, we have applied molecular dynamics simulations to study the delamination of a stiff body-centered-cubic crystalline film from a compliant Si substrate due to tensile loading. The observed mechanical behavior is shown to be relatively independent of small changes in temperature, loading rate, and system size. Fracture occurs at the interface between the two materials resulting in nearly atomically clean surfaces. Dislocations are seen to nucleate in the body-centered-cubic film prior to delamination. At higher strains, a phase change to a face centered cubic is observed within the body-centered-cubic film, facilitating extensive dislocation growth and interaction. The various defects that form prior to fracture are discussed and related to the mechanical properties of the system.

  5. Nucleation and growth of cubic boron nitride films produced by ion-assisted pulsed laser deposition

    SciTech Connect

    Friedmann, T.A.; Medlin, D.L.; Mirkarimi, P.B.; McCarty, K.F.; Klaus, E.J.; Boehme, D.R.; Johnsen, H.A.; Mills, M.J.; Ottesen, D.K.

    1993-12-31

    We are studying the boron nitride system using a pulsed excimer laser to ablate from hexagonal BN (cBN) targets to form cubic BN (cBN) films. We are depositing BN films on heated (25--800C) Si (100) surfaces and are using a broad-beam ion source operated with Ar and N{sub 2} source gases to produce BN films with a high percentage of sp{sup 3}-bonded cBN. In order to optimize growth and nucleation of cBN films, parametric studies of the growth parameters have been performed. The best films to date show >85% sp{sup 3}-bonded BN as determined from Fourier-transform infrared (FTIR) reflection spectroscopy. High resolution transmission electron microscopy (TEM) and selected area electron diffraction confirm the presence of cBN in these samples. The films are polycrystalline and show grain sizes up to 30--40 mn. We find from both the FTIR and TEM analyses that the cBN content in these films evolves with growth time. Initially, the films are deposited as hBN and the cBN nucleates on this hBN underlayer. Importantly, the position of the cBN IR phonon also changes with growth time. Initially this mode appears near 1130 cm{sup {minus}1} and the position decreases with growth time to a constant value of 1085 cm{sup {minus}1}. Since in bulk cBN this IR mode appears at 1065 cm{sup {minus}1}, a large compressive stress induced by the ion bombardment is suggested. In addition, we report on the variation in cBN percentage with temperature.

  6. Surface Chemistry, Microstructure, and Tribological Properties of Cubic Boron Nitride Films

    NASA Technical Reports Server (NTRS)

    Watanabe, Shuichi; Wheeler, Donald R.; Abel, Phillip B.; Street, Kenneth W.; Miyoshi, Kazuhisa; Murakawa, Masao; Miyake, Shojiro

    1998-01-01

    This report deals with the surface chemistry, microstructure, bonding state, morphology, and friction and wear properties of cubic boron nitride (c-BN) films that were synthesized by magnetically enhanced plasma ion plating. Several analytical techniques - x-ray photoelectron spectroscopy, transmission electron microscopy and electron diffraction, Fourier transform infrared spectroscopy, atomic force microscopy, and surface profilometry - were used to characterize the films. Sliding friction experiments using a ball-on-disk configuration were conducted for the c-BN films in sliding contact with 440C stainless-steel balls at room temperature in ultrahigh vacuum (pressure, 10(exp -6), in ambient air, and under water lubrication. Results indicate that the boron-to-nitrogen ratio on the surface of the as-deposited c-BN film is greater than 1 and that not all the boron is present as boron nitride but a small percentage is present as an oxide. Both in air and under water lubrication, the c-BN film in sliding contact with steel showed a low wear rate, whereas a high wear rate was observed in vacuum. In air and under water lubrication, c-BN exhibited wear resistance superior to that of amorphous boron nitride, titanium nitride, and titanium carbide.

  7. Cubic AlN thin film formation on quartz substrate by pulse laser deposition

    NASA Astrophysics Data System (ADS)

    Biju, Zheng; Wen, Hu

    2016-06-01

    Cubic AlN thin films were obtained on quartz substrate by pulse laser deposition in a nitrogen reactive atmosphere. A Nd-YAG laser with a wavelength of 1064 nm was used as the laser source. In order to study the influence of the process parameters on the deposited AlN film, the experiments were performed at various technique parameters of laser energy density from 70 to 260 J/cm2, substrate temperature from room temperature to 800 °C and nitrogen pressure from 0.1 to 50 Pa. X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy were applied to characterize the structure and surface morphology of the deposited AlN films. It was found that the structure of AlN films deposited in a vacuum is rocksalt under the condition of substrate temperature 600-800 °C, nitrogen pressure 10-0.1 Pa and a moderate laser energy density (190 J/cm2). The high quality AlN film exhibited good optical property. Project supported by the Yunnan Provincial Natural of Science Foundation of China (No. KKSY201251089).

  8. Functionalization of cubic boron nitride films with rhodamine B and their fluorescent properties

    SciTech Connect

    Liu, W. M.; Zhang, H. Y.; Wang, P. F.; Ye, Q.; Yang, Y.; He, B.; Bello, I.; Lee, S. T.; Zhang, W. J.

    2011-08-08

    Fluorophore-functionalized cubic boron nitride (cBN) films grown by chemical vapor deposition were achieved by immobilizing rhodamine B isothiocyanate onto their surfaces. To perform the immobilization, the cBN substrates were modified with amino groups by photochemical reaction between hydrogen-terminated cBN surfaces and allylamine. The surface analysis of hydrogen-terminated cBN films surfaces and after functionalization with x-ray photoelectron spectroscopy verified that rhodamine B was indeed attached to the cBN surfaces with covalent bonding. The rhodamine B-functionalized cBN surfaces showed significant variation in fluorescent spectra and confocal imaging upon the treatment in acidic or basic solutions.

  9. Vertical alignment of liquid crystal through ion beam exposure on oxygen-doped SiC films deposited at room temperature

    SciTech Connect

    Son, Phil Kook; Park, Jeung Hun; Kim, Jae Chang; Yoon, Tae-Hoon; Rho, Soon Joon; Jeon, Back Kyun; Shin, Sung Tae; Kim, Jang Sub; Lim, Soon Kwon

    2007-09-03

    The authors report the vertical alignment of liquid crystal (LC) through the ion beam exposure on amorphous oxygen-doped SiC (SiOC) film surfaces deposited at room temperature. The optical transmittance of these films was similar to that of polyimide layers, but much higher than that of SiO{sub x} films. The light leakage of a LC cell aligned vertically on SiOC films was much lower than those of a LC cell aligned on polyimide layers or other inorganic films. They found that LC molecules align vertically on ion beam treated SiOC film when the roughness of the electrostatic force microscopy (EFM) data is high on the SiOC film surface, while they align homogeneously when the roughness of the EFM data is low.

  10. Effect of cubic phase evolution on field emission properties of boron nitride island films

    SciTech Connect

    Teii, Kungen; Yamao, Ryota; Matsumoto, Seiichiro

    2009-12-01

    Field emission performance of boron nitride (BN) island films is studied in terms of cubic phase evolution in plasma-enhanced chemical vapor deposition. Fine-grained island films with large surface roughness can be grown for initial sp{sup 2}-bonded BN and subsequent cubic BN (cBN) phases by using low-energy (approx20 eV) ion bombardment. Ultraviolet photoelectron spectroscopy reveals that the electron affinity is as low as 0.3 eV for both sp{sup 2}-bonded BN and cBN phases. The evolution of cBN islands reduces the turn-on field down to around 9 V/mum and increases the current density up to 10{sup -4} A/cm{sup 2}. The emission is facilitated by the larger field enhancement due to the larger roughness and the higher conduction of cBN islands. The potential barrier height is estimated to be about 3.4 eV for emission from the Fermi level, while it is only about 0.3 eV for 'conduction band emission'.

  11. Consideration of the formation mechanism of an Al2O3-HfO2 eutectic film on a SiC substrate

    NASA Astrophysics Data System (ADS)

    Seya, Kyosuke; Ueno, Shunkichi; Nishimura, Toshiyuki; Jang, Byung-Koog

    2016-01-01

    An Al2O3-HfO2 eutectic EBC film was prepared on a SiC substrate by using the electric furnace heating and the optical zone melting methods. All of Al2O3 phase disappeared during the heating step at a temperature below the melting point, and all of the HfO2 phase reacted with the carbon and boron, which are included in SiC bulk as sintering agents, during the heating step at a temperature below the melting point. The thermal decomposition of the SiC phase, the reduction reaction of Al2O3 phase, the vaporization of the Al2O3 component, the reduction reaction of HfO2 and the formation of the HfC phase occurred at a temperature below the melting point. However, a highly dense HfC phase was formed on the SiC substrate. A rapid heating process becomes possible by using the optical zone melting method. A solidified film that was composed of a highly dense HfC layer as the intermediate layer and the Al2O3-HfO2 eutectic structure layer as the top coat was obtained by using the optical zone melting method.

  12. Methods for growth of relatively large step-free SiC crystal surfaces

    NASA Technical Reports Server (NTRS)

    Neudeck, Philip G. (Inventor); Powell, J. Anthony (Inventor)

    2002-01-01

    A method for growing arrays of large-area device-size films of step-free (i.e., atomically flat) SiC surfaces for semiconductor electronic device applications is disclosed. This method utilizes a lateral growth process that better overcomes the effect of extended defects in the seed crystal substrate that limited the obtainable step-free area achievable by prior art processes. The step-free SiC surface is particularly suited for the heteroepitaxial growth of 3C (cubic) SiC, AlN, and GaN films used for the fabrication of both surface-sensitive devices (i.e., surface channel field effect transistors such as HEMT's and MOSFET's) as well as high-electric field devices (pn diodes and other solid-state power switching devices) that are sensitive to extended crystal defects.

  13. Growth of SiC thin films on (100) and (111) silicon by pulsed laser deposition combined with a vacuum annealing process

    SciTech Connect

    Huang, J.; Wang, L.; Wen, J.; Wang, Y.; Lin, C.; Zetterling, C.M.; Oestling, M.

    1999-07-01

    Crystalline 3C-SiC thin films were successfully grown on (100) and (111) Si substrates by using ArF pulsed laser ablation from a SiC ceramic target combined with a vacuum annealing process. X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FTIR) were employed to study the effect of annealing on the structure of thin films deposited at 800 C. It was demonstrated that vacuum annealing could transform the amorphous SiC films into crystalline phase and that the crystallinity was strongly dependent on the annealing temperature. For the samples deposited on (100) and (111) Si, the optimum annealing temperatures were 980 and 920 C, respectively. Scanning electron microscope (SEM) micrographs exhibited different characteristic microstructure for the (100) and (111) Si cases, similar to that observed for the carbonization layer initially formed in chemical vapor deposition of SiC films on Si. This also showed the presence of the epitaxial relationship of 3C-SiC[100]//Si[100] and 3C-SiC[111]//Si[111] in the direction of growth.

  14. Cubic-BN-Like Structure of B-C-N Films Synthesized by Plasma Source Ion Nitriding

    NASA Astrophysics Data System (ADS)

    Lei, Ming-kai; Yuan, Li-jiang; Zhang, Zhong-lin; Ma, Teng-cai

    1999-01-01

    Plasma source ion nitriding has emerged as a low-temperature, low-pressure nitriding approach for implanting nitrogen ions and then diffusing them into bulk materials. The ion-plating B-C films were nitrided to synthesize B-C-N films at a nitriding temperature from 300 to 500° C. The x-ray photoelectron spectroscopy and diffuse reflectance Fourier transform infrared spectra analyses showed that the amorphous B-C-N films synthesized at 500° C are composed mainly of cubic-BN-like and hexagonal-BN-like plain microdomains. The higher nitriding temperature contributes to the formation of cubic-BN-like B-C-N structure in the B-C-N films.

  15. Hardness and Young's modulus of high-quality cubic boron nitride films grown by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Jiang, X.; Philip, J.; Zhang, W. J.; Hess, P.; Matsumoto, S.

    2003-02-01

    The elastic and mechanical properties of high-quality cubic boron nitride (cBN) films with a few microns thickness and submicron grain size grown on silicon substrates by chemical vapor deposition were determined by measuring the dispersion of surface acoustic waves propagating along the surface of the layered system. The values are compared with those obtained with an ultralow load indenter (Triboscope). Specifically, the hardness, Young's modulus and density of the film were measured.

  16. Preparation of cubic boron nitride films by radio frequency magnetron sputtering and radio frequency ion plating

    NASA Astrophysics Data System (ADS)

    Ulrich, S.; Scherer, J.; Schwan, J.; Barzen, I.; Jung, K.; Scheib, M.; Ehrhardt, H.

    1996-02-01

    Cubic boron nitride (c-BN) thin films have been deposited by unbalanced rf (13.56 MHz) magnetron sputtering of a hexagonal boron nitride target in a pure argon discharge. Deposition parameters have been 300 W rf target power, 8×10-4 mbar argon pressure, 3.5 cm target substrate distance, and 800 K substrate temperature. Under these conditions the ion current density is 2.25 mA/cm2 and the growth rate is ˜1.1 Å/s. By applying a rf substrate bias the ion plating energy is varied from plasma potential of 37 eV up to 127 eV. The films have been characterized by infrared (IR) and Auger electron spectroscopy (AES), x-ray diffraction (XRD), x-ray reflectivity, elastic recoil detection (ERD), Rutherford backscattering (RBS), nuclear resonance analysis (NRA), and stress measurements. The subplantation model proposed by Lifshitz and Robertson can be applied to the c-BN formation. An energy of about 85±5 eV is found where the stress (25 GPa, 200 nm film thickness) and the c-BN content (≳90%) have a maximum. The grain size of the crystalline c-BN phase was estimated to be in the range of 5 nm. Below an energy of 67±5 eV no c-BN could be detected. An excellent adhesion has been obtained by a special interface treatment.

  17. A study on various fabrication routes for preparing multilayered cubic boron nitride films and sp(3)-like boron nitride films

    NASA Astrophysics Data System (ADS)

    Wong, Sing Fai

    Cubic boron nitride (cBN) has a sp3-bonded structure which leads to excellent mechanical properties. Though cBN-rich films have been successfully fabricated by many techniques, the adhesion of the films is still unsatisfactory due to the high stresses. The maximum sustainable thickness of cBN-rich films with good adhesion is widely reported to be around 200 nm, so many practical applications of cBN coatings are hindered. In this study, we designed a series of deposition schemes in a logical sequence, in order to explore whether stress can be released, or other structural forms of BN with potential applications can be made, and to gain more fundamental understanding on the growth mechanisms of various phases observed in the films. Various fabrication processes were employed according to the following sequence: (1) A single-step process. It was showed that the maximum tolerable thickness of the cBN-rich films prepared by our system (183nm) was compatible with the result in literatures (200nm). (2) A multilayered deposition process. A thick sp2-bonded boron nitride (sP2-BN) buffer layer which was relatively deformable was added, and hence some stresses were released so as to allow a 643nm-thick, 87vol.% cBN-rich layer with acceptable adhesion to grow on top. (3) An advanced multilayer process with subsequent annealing process. A zirconium layer was pre-deposited to remove the soft buffer layer after postannealing. The interface could be strengthened as the zirconium-boride/nitride was formed. (4) Ion assist deposition at unheated condition. Composite BN films containing sp3 nanoclusters embedded in a sp2-BN matrix were fabricated. The IR technique was not sensitive enough to detect spa nanoclusters, but their presence was verified by the results of other measurements. In particular, the sp3 content can be over 30vo1.%, with a hardness 20GPa. The influences of the assist beam energy and substrate temperature on the generation of the sp3 nanoclusters were investigated

  18. Deposition of AlN Thin Films with Cubic Crystal Structures on Silicon Substrates at Room Temperature

    NASA Astrophysics Data System (ADS)

    Ren, Zhong-Min; Lu, Yong-Feng; Goh, Yeow-Whatt; Chong, Tow-Chong; Ng, Mei-Ling; Wang, Jian-Ping; Cheong, Boon-Aik; Liew, Yun-Fook

    2000-05-01

    Cubic AlN thin films were deposited at room temperature by nitrogen-ion-assisted pulsed laser ablation of a hexagonal AlN target. The full-width at half maximum (FWHM) of the X-ray diffraction peak in the θ˜ 2θ scan can reach a value of 0.27 degrees. In the Raman spectroscopy measurement, a new peak at 2333 cm-1 originating from cubic AlN polycrystalline was observed. Nitrogen ions not only effectively promote the formation of stable Al-N bonds but also improve the crystal properties of the deposited thin films. A nitrogen ion energy of 400 eV is proposed for the thin-film deposition.

  19. Direct deposition of cubic boron nitride films on tungsten carbide-cobalt.

    PubMed

    Teii, Kungen; Matsumoto, Seiichiro

    2012-10-24

    Thick cubic boron nitride (cBN) films in micrometer-scale are deposited on tungsten carbide-cobalt (WC-Co) substrates without adhesion interlayers by inductively coupled plasma-enhanced chemical vapor deposition (ICP-CVD) using the chemistry of fluorine. The residual film stress is reduced because of very low ion-impact energies (a few eV to ∼25 eV) controlled by the plasma sheath potential. Two types of substrate pretreatment are used successively; the removal of surface Co binder using an acid solution suppresses the catalytic effect of Co and triggers cBN formation, and the surface roughening using mechanical scratching and hydrogen plasma etching increases both the in-depth cBN fraction and deposition rate. The substrate surface condition is evaluated by the wettability of the probe liquids with different polarities and quantified by the apparent surface free energy calculated from the contact angle. The surface roughening enhances the compatibility in energy between the cBN and substrate, which are bridged by the interfacial sp(2)-bonded hexagonal BN buffer layer, and then, the cBN overlayer is nucleated and evolved easier. PMID:22950830

  20. Red, green and blue reflections enabled in an optically tunable self-organized 3D cubic nanostructured thin film.

    PubMed

    Lin, Tsung-Hsien; Li, Yannian; Wang, Chun-Ta; Jau, Hung-Chang; Chen, Chun-Wei; Li, Cheng-Chung; Bisoyi, Hari Krishna; Bunning, Timothy J; Li, Quan

    2013-09-25

    A new light-driven chiral molecular switch doped in a stable blue phase (BP) liquid crystal allows wide optical tunability of three-dimensional cubic nanostructures with a selective reflection wavelength that is reversibly tuned through the visible region. Moreover, unprecedented reversible light-directed red, green, and blue reflections of the self-organized three-dimensional cubic nanostructure in a single film are demonstrated for the first time. Additionally, unusual isothermal photo-stimulated less ordered BP II to more ordered BP I phase transition was observed in the system. PMID:23913627

  1. Etching characteristics and mechanisms of SiC thin films in inductively-coupled HBr-Ar, N{sub 2}, O{sub 2} plasmas

    SciTech Connect

    Efremov, Alexander; Kang, Sungchil; Kwon, Kwang-Ho; Seok Choi, Won

    2011-11-15

    Etch characteristics and mechanisms of SiC thin films in HBr-Ar, HBr-N{sub 2}, and HBr-O{sub 2} inductively-coupled plasmas were studied using a combination of experimental and modeling methods. The etch rates of SiC thin films were measured as functions of the additive gas fraction in the range of 0-100% for Ar, N{sub 2}, and O{sub 2} at a fixed gas pressure (6 mTorr), input power (700 W), bias power (200 W), and total gas flow rate (40 sccm). The plasma chemistry was analyzed using Langmuir probe diagnostics and a global (zero-dimensional) plasma model. The good agreement between the behaviors of the SiC etch rate and the H atom flux could suggest that a chemical etch pathway is rather controlled by the gasification of carbon through the CH{sub x} or CH{sub x}Br{sub y} compounds.

  2. The Improvement of Ion Plated Ag and Au Film Adherence to Si3N4 and SiC Surfaces for Increased Tribological Performance

    NASA Technical Reports Server (NTRS)

    Spalvins, Talivaldis

    1998-01-01

    A modified dc-diode plating system, utilizing a metallic screen cage as a cathode and referred as SCREEN CAGE ION PLATING (SCIP), is used to deposit Ag and Au lubricating films on Si3N4 and SiC surfaces. When deposition is performed in Ar or N2, glow discharge, the surface displays poor adhesive strength (less than 5 MPa). A dramatic increase in adhesive strength (less than 80 MPa) is achieved when plating is performed in a reactive 50% 02 + 50% Ar glow discharge. The excited/ionized oxygen species (O2(+)/O(+) in the glow discharge contribute to the oxidation of the Si3N4 or SiC surfaces as determined by X-ray Photoelectron Spectroscopy (XTS) depth profiling. The reactively sputter-oxidized S3N4 or SiC surfaces and the activated-oxidized-metastable Ag or Au species formed in the plasma cooperatively contribute to the increased adherence. As a result, the linear thermal expansion coefficient mismatch at the interface is reduced. These lubricating Ag and Au films under sliding conditions reduce the friction coefficient by a factor of 2-1/2 to 4.

  3. Wurtzite ZnO (001) films grown on cubic MgO (001) with bulk-like opto-electronic properties

    SciTech Connect

    Zhou Hua; Wang Huiqiong; Chen Xiaohang; Zhan Huahan; Kang Junyong; Wu Lijun; Zhu Yimei; Zhang Lihua; Kisslinger, Kim

    2011-10-03

    We report the growth of ZnO (001) wurtzite thin films with bulk-like opto-electronic properties on MgO (001) cubic substrates using plasma-assisted molecular beam epitaxy. In situ reflection high-energy electron diffraction patterns and ex situ high resolution transmission electron microscopy images indicate that the structure transition from the cubic MgO substrates to the hexagonal films involves 6 ZnO variants that have the same structure but different orientations. This work demonstrates the possibility of integrating wurtzite ZnO films and functional cubic substrates while maintaining their bulk-like properties.

  4. The Urbach focus and optical properties of amorphous hydrogenated SiC thin films

    NASA Astrophysics Data System (ADS)

    Guerra, J. A.; Angulo, J. R.; Gomez, S.; Llamoza, J.; Montañez, L. M.; Tejada, A.; Töfflinger, J. A.; Winnacker, A.; Weingärtner, R.

    2016-05-01

    We report on the optical bandgap engineering of sputtered hydrogenated amorphous silicon carbide (a-SiC:H) thin films under different hydrogen dilution conditions during the deposition process and after post-deposition annealing treatments. The Tauc-gap and Urbach energy are calculated from ultraviolet-visible optical transmittance measurements. Additionally, the effect of the thermal annealing temperature on the hydrogen out-diffusion is assessed through infra-red absorption spectroscopy. A new model for the optical absorption of amorphous semiconductors is presented and employed to determine the bandgap as well as the Urbach energy from a single fit of the absorption coefficient. This model allowed the discrimination of the Urbach tail from the Tauc region without any external bias. Finally, the effect of the hydrogen dilution on the band-edge and the Urbach focus is discussed.

  5. Interplay of uniaxial and cubic anisotropy in epitaxial Fe thin films on MgO (001) substrate

    NASA Astrophysics Data System (ADS)

    Mallik, Srijani; Chowdhury, Niru; Bedanta, Subhankar

    2014-09-01

    Epitaxial Fe thin films were grown on annealed MgO(001) substrates at oblique incidence by DC magnetron sputtering. Due to the oblique growth configuration, uniaxial anisotropy was found to be superimposed on the expected four-fold cubic anisotropy. A detailed study of in-plane magnetic hysteresis for Fe on MgO thin films has been performed by Magneto Optic Kerr Effect (MOKE) magnetometer. Both single step and double step loops have been observed depending on the angle between the applied field and easy axis i.e. along ⟨100⟩ direction. Domain images during magnetization reversal were captured by Kerr microscope. Domain images clearly evidence two successive and separate 90° domain wall (DW) nucleation and motion along cubic easy cum uniaxial easy axis and cubic easy cum uniaxial hard axis, respectively. However, along cubic hard axis two 180° domain wall motion dominate the magnetization reversal process. In spite of having four-fold anisotropy it is essential to explain magnetization reversal mechanism in 0°< ϕ < 90° span as uniaxial anisotropy plays a major role in this system. Also it is shown that substrate rotation can suppress the effect of uniaxial anisotropy superimposed on four-fold anisotropy.

  6. Current-direction dependence of the transport properties in single-crystalline face-centered-cubic cobalt films

    NASA Astrophysics Data System (ADS)

    Xiao, X.; Liang, J. H.; Chen, B. L.; Li, J. X.; Ma, D. H.; Ding, Z.; Wu, Y. Z.

    2015-07-01

    Face-centered-cubic cobalt films are epitaxially grown on insulating LaAlO3(001) substrates by molecular beam epitaxy. Transport measurements are conducted in different current directions relative to the crystal axes. We find that the temperature dependent anisotropic magnetoresistance ratio strongly depends on the current direction. However, the anomalous Hall effect shows isotropic behavior independent of the current direction. Our results demonstrate the interplay between the current direction and the crystalline lattice in single-crystalline ferromagnetic films. A phenomenological analysis is presented to interpret the experimental data.

  7. Damage effects from medium-energy ion bombardment during the growth of cubic-boron nitride films

    NASA Astrophysics Data System (ADS)

    Gago, R.; Vinnichenko, M.; Abendroth, B.; Kolitsch, A.; Möller, W.

    2003-09-01

    Cubic-boron nitride (c-BN) films with low stress have been produced by simultaneous 35 keV N+ ion implantation during growth by ion assisted sputtering. The stress release is achieved at the lost of a decrease in the c-BN content. Despite this fact, films with a high c-BN content and relatively large thickness (~0.4 μm) have been produced. The decrease on the c-BN content is discussed in terms of the damage induced by the medium-energy ion implantation.

  8. Tunable in situ growth of porous cubic silicon carbide thin films via methyltrichlorosilane-based chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Lien, Wei-Cheng; Ferralis, Nicola; Pisano, Albert P.; Carraro, Carlo; Maboudian, Roya

    2009-09-01

    The growth of cubic silicon carbide films with tunable porosity is demonstrated on Si(100) using a single precursor, methyltrichlorosilane, chemical vapor deposition process in the temperature range of 950-1200 °C. The pore size varies in the range from 250 nm to 2 μm and it is controlled by the growth temperature and the details of hydrogen introduction during substrate heating stage. It is proposed that silicon outdiffusion from substrate combined with hydrogen chloride production and adsorption on the surface at high temperature may be responsible for the porous films thus produced.

  9. Current-direction dependence of the transport properties in single-crystalline face-centered-cubic cobalt films

    SciTech Connect

    Xiao, X.; Liang, J. H.; Chen, B. L.; Li, J. X.; Ding, Z.; Wu, Y. Z.; Ma, D. H.

    2015-07-28

    Face-centered-cubic cobalt films are epitaxially grown on insulating LaAlO{sub 3}(001) substrates by molecular beam epitaxy. Transport measurements are conducted in different current directions relative to the crystal axes. We find that the temperature dependent anisotropic magnetoresistance ratio strongly depends on the current direction. However, the anomalous Hall effect shows isotropic behavior independent of the current direction. Our results demonstrate the interplay between the current direction and the crystalline lattice in single-crystalline ferromagnetic films. A phenomenological analysis is presented to interpret the experimental data.

  10. Chemical vapor deposition of Si:C and Si:C:P films-Evaluation of material quality as a function of C content, carrier gas and doping

    NASA Astrophysics Data System (ADS)

    Dhayalan, Sathish Kumar; Loo, Roger; Hikavyy, Andriy; Rosseel, Erik; Bender, Hugo; Richard, Olivier; Vandervorst, Wilfried

    2015-09-01

    Incorporation of source-drain stressors (S/D) for FinFETs to boost the channel mobility is a promising scaling approach. Typically SiGe:B S/D stressors are used for p FinFETs and Si:C:P S/D stressors for n FinFETs. The deposition of such Si:C:P S/D stressors requires a low thermal budget to freeze the C in substitutional sites and also to avoid problems associated with surface reflow of Si fins. In this work, we report the material properties of Si:C and Si:C:P epitaxial layers grown by chemical vapor deposition, in terms of their defectivity and C incorporation as a function of different process conditions. The undoped Si:C layers were found to be defect free for total C contents below 1%. Above this concentration defects were incorporated and the defect density increased with increasing C content. Abrupt epitaxial breakdown occurred beyond a total C content of 2.3% resulting in amorphous layers. P doping of Si:C layers brought down the resistivity and also thicker Si:C:P films underwent epitaxial breakdown. Additionally, the use of nitrogen instead of hydrogen as carrier gas resulted in an increase of the growth rate and substitutional C incorporation both by a factor of two, while the surface defect density reduced.

  11. Effect of Tilt Angle on the Morphology of SiC Epitaxial Films Grown on Vicinal (0001) SiC Substrates

    NASA Technical Reports Server (NTRS)

    Powell, J. A.; Larkin, D. J.; Abel, P. B.; Zhou, L.; Pirouz, P.

    1996-01-01

    In this study of 4H-SiC and 6H-SiC epitaxial films we found that film morphology was strongly dependent on the tilt angle of the substrate. Large surface steps (up to 25 nm high) due to step bunching were more prevalent at smaller tilt angles. Also, 4H films were more susceptible than 6H to 3C-SiC inclusions during growth. The lateral growth of steps from screw dislocations in low-tilt-angle substrates demonstrated that step bunching on the atomic scale was anisotropic with respect to growth direction for both 4H-SiC and 6H-SiC. A model explaining this behavior is presented. We observed and directly measured the Burgers vector of a 'super' screw dislocation in a 6H-SiC epilayer.

  12. Three-dimensional kinetic Monte Carlo simulations of cubic transition metal nitride thin film growth

    NASA Astrophysics Data System (ADS)

    Nita, F.; Mastail, C.; Abadias, G.

    2016-02-01

    A three-dimensional kinetic Monte Carlo (KMC) model has been developed and used to simulate the microstructure and growth morphology of cubic transition metal nitride (TMN) thin films deposited by reactive magnetron sputtering. Results are presented for the case of stoichiometric TiN, chosen as a representative TMN prototype. The model is based on a NaCl-type rigid lattice and includes deposition and diffusion events for both N and Ti species. It is capable of reproducing voids and overhangs, as well as surface faceting. Simulations were carried out assuming a uniform flux of incoming particles approaching the surface at normal incidence. The ballistic deposition model is parametrized with an interaction parameter r0 that mimics the capture distance at which incoming particles may stick on the surface, equivalently to a surface trapping mechanism. Two diffusion models are implemented, based on the different ways to compute the site-dependent activation energy for hopping atoms. The influence of temperature (300-500 K), deposition flux (0.1-100 monolayers/s), and interaction parameter r0 (1.5-6.0 Å) on the obtained growth morphology are presented. Microstructures ranging from highly porous, [001]-oriented straight columns with smooth top surface to rough columns emerging with different crystallographic facets are reproduced, depending on kinetic restrictions, deposited energy (seemingly captured by r0), and shadowing effect. The development of facets is a direct consequence of the diffusion model which includes an intrinsic (minimum energy-based) diffusion anisotropy, although no crystallographic diffusion anisotropy was explicitly taken into account at this stage. The time-dependent morphological evolution is analyzed quantitatively to extract the growth exponent β and roughness exponent α , as indicators of kinetic roughening behavior. For dense TiN films, values of α ≈0.7 and β =0.24 are obtained in good agreement with existing experimental data. At this

  13. Study of structural properties of cubic InN films on GaAs(001) substrates by molecular beam epitaxy and migration enhanced epitaxy

    SciTech Connect

    Casallas-Moreno, Y. L.; Perez-Caro, M.; Gallardo-Hernandez, S.; Ramirez-Lopez, M.; Martinez-Velis, I.; Lopez-Lopez, M.; Escobosa-Echavarria, A.

    2013-06-07

    InN epitaxial films with cubic phase were grown by rf-plasma-assisted molecular beam epitaxy (RF-MBE) on GaAs(001) substrates employing two methods: migration-enhanced epitaxy (MEE) and conventional MBE technique. The films were synthesized at different growth temperatures ranging from 490 to 550 Degree-Sign C, and different In beam fluxes (BEP{sub In}) ranging from 5.9 Multiplication-Sign 10{sup -7} to 9.7 Multiplication-Sign 10{sup -7} Torr. We found the optimum conditions for the nucleation of the cubic phase of the InN using a buffer composed of several thin layers, according to reflection high-energy electron diffraction (RHEED) patterns. Crystallographic analysis by high resolution X-ray diffraction (HR-XRD) and RHEED confirmed the growth of c-InN by the two methods. We achieved with the MEE method a higher crystal quality and higher cubic phase purity. The ratio of cubic to hexagonal components in InN films was estimated from the ratio of the integrated X-ray diffraction intensities of the cubic (002) and hexagonal (1011) planes measured by X-ray reciprocal space mapping (RSM). For MEE samples, the cubic phase of InN increases employing higher In beam fluxes and higher growth temperatures. We have obtained a cubic purity phase of 96.4% for a film grown at 510 Degree-Sign C by MEE.

  14. Determining polytype composition of silicon carbide films by UV ellipsometry

    NASA Astrophysics Data System (ADS)

    Kukushkin, S. A.; Osipov, A. V.

    2016-02-01

    A universal ellipsometric model is proposed that describes the optical properties of silicon carbide (SiC) films grown on Si substrates by the method of atomic substitution due to a chemical reaction between the substrate and gaseous carbon monoxide. According to the proposed three-layer model, Si concentration decreases in a stepwise manner from the substrate to SiC film surface. The ellipsometric curves of SiC/Si(111), SiC/Si(100), and SiC/Si(110) samples grown under otherwise identical conditions have been measured in a 1.35-9.25 eV range using a VUV-VASE (J.A. Woollam Co.) ellipsometer with a rotating analyzer. Processing of the obtained spectra in the framework of the proposed model allowed the polytype composition of SiC films to be determined for the first time. It is established that SiC grown on Si(111) is predominantly cubic, while SiC on Si(110) is predominantly hexagonal (with cubic polytype admixture) and SiC on Si(100) has a mixed polytype composition.

  15. Correlation between stress profiles of cubic boron nitride thin films and the phase sequence revealed from infrared data

    NASA Astrophysics Data System (ADS)

    Klett, A.; Malavé, A.; Freudenstein, R.; Plass, M. F.; Kulisch, W.

    Cubic boron nitride thin films have been ion-beam-assisted deposited on silicon cantilever structures and subsequently back-etched in order to study the stress evolution and finally the growth mechanisms. After each sputtering step, the film stress, the remaining thickness, and the IR data were examined. In this way, the layered sequence of cBN on top of a hBN base layer, influencing the development of the intrinsic film stress, could be studied in detail. The observed stress distribution can be divided into three regions. First, a non-cubic base layer with a constant stress value is formed, followed by a linear increase in the stress after cBN nucleation as a result of the coalescence of cBN nanocrystals. Finally, the stress reaches a second plateau characteristic of the cBN top layer. In addition, the layered sequence was verified by the evolution of the FTIR spectra. Furthermore, the fraction of the sp2-bonded material of the cBN top layer was determined from the IR data. For various deposition conditions, a linear relationship between the stress of the nanocrystalline cBN top layer and the amount of sp3-bonded material was observed. From this, it can be concluded that stress relaxation occurs at the sp2-bonded grain boundary material. No evidence for stress relaxation after cBN nucleation was found.

  16. A Comparison of the Effects of RF Plasma Discharge and Ion Beam Supply on the Growth of Cubic Boron Nitride Films Formed by Laser Physical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Kaneda, Kayo; Shibata, Kimihiro

    1994-01-01

    This paper presents a comparison of the effects of RF plasma discharge and ion beam supply on the growth of cubic boron nitride films formed by excimer laser physical vapor deposition (laser PVD). The film structure was analyzed by fourier transformation infrared region (FT-IR) spectroscopy and thin-film X-ray diffraction analysis. The structure of the film deposited with an RF plasma discharge provided between the substrate and target was hexagonal BN. On the other hand, that of the film deposited by irradiating the substrate directly with an ion beam was hexagonal BN (hBN) and cubic BN (cBN). It is thought that direct irradiation of the vapor generated from the target by accelerated ions increased the activation energy of the vapor, with the result that the film structure was changed. Besides irradiating the substrate directly with the ion beam resulted primarily in the etching of hBN while cBN remained.

  17. Orientational relationship between cubic boron nitride and hexagonal boron nitride in a thin film synthesized by ion plating

    NASA Astrophysics Data System (ADS)

    Zhou, Wei-Lie; Ikuhara, Yuichi; Suzuki, Tetsuya

    1995-12-01

    Cubic boron nitride (c-BN) thin films synthesized by the ion-plating method were examined by high-resolution electron microscopy. It was found that the {0002} planes of hexagonal boron nitride (h-BN) at the boundaries of c-BN grains preferred to nucleate almost parallel to {111} planes of c-BN. Cross-sectional observation in the initial stage of growth showed that the c-BN can grow on top of the prismatic planes and the {0001} basal planes of h-BN, keeping the parallelism of the (111)c-BN to (0001)h-BN. A few degrees deviation (˜4°) between h-BN {0002} planes and c-BN {111} planes was frequently found in the film. The nucleation mechanism of c-BN was discussed analogous to that of diamond on graphite.

  18. Homo- and hetero-epitaxial growth of hexagonal and cubic MgxZn1-x O alloy thin films by pulsed laser deposition technique

    NASA Astrophysics Data System (ADS)

    Hullavarad, S. S.; Hullavarad, N. V.; Pugel, D. E.; Dhar, S.; Takeuchi, I.; Venkatesan, T.; Vispute, R. D.

    2007-08-01

    In this work, we describe the homo- and hetero-epitaxial growth of hexagonal and cubic MgxZn1-xO thin films on lattice matched substrates of c-Al2O3, ZnO, MgO and SrTiO3. The crystalline quality, composition and epitaxial nature of the alloy films are obtained by x-ray diffraction and Rutherford backscattering spectroscopy (RBS) techniques. The RBS channeling yields are in the range 3-8% for homoepitaxial and hetero-epitaxial thin films. The metal-semiconductor-metal and ultraviolet detectors were fabricated on hexagonal and cubic MgxZn1-xO thin films and the leakage current and UV-visible rejection ratio are correlated with the epitaxial relationship between the film and substrates.

  19. Static and dynamic magnetic properties of cubic Mn-Co-Ga Heusler films

    SciTech Connect

    Demiray, A. S. Iihama, S.; Naganuma, H.; Oogane, M.; Ando, Y.; Kubota, T.; Mizukami, S. Miyazaki, T.

    2014-05-07

    We investigated the static and dynamic magnetic properties of thin films of Mn-Co-Ga Heusler compound. Gilbert damping and exchange stiffness constants of the films were evaluated by using the ferromagnetic resonance technique in the X-band regime (f = 9.4 GHz). By analyzing the experimental spectra, magnetic parameters of the films such as the line width and the Gilbert damping were deduced, and the exchange stiffness constant was estimated from the perpendicular standing spin-wave resonance. The Gilbert damping constant was estimated to be 0.017 in a specific film composition. The exchange stiffness constant showed a linear dependence on the film composition.

  20. Oxidation behavior of CVD and single crystal SiC at 1100 C

    SciTech Connect

    Ramberg, C.E.; Spear, K.E.; Tressler, R.E.; Chinone, Yoshiharu

    1995-11-01

    High purity chemical vapor deposition (CVD) silicon carbide fabricated by a commercial process was examined and oxidized at 1,100 C along with high purity single crystal silicon carbide. The freestanding CVD thick films had a highly textured polycrystalline microstructure, with the <111> directions of the crystals parallel to the growth direction. This texturing maintained the polarity of the 43m crystal structure, implying that either the [111] or the [1{und 1}1] direction grew significantly faster during the CVD process. The (111) face of the cubic, CVD-SiC oxidized at the same rate as the (0001) face of the single crystal SiC. The (111) face of the CVD-SiC oxidized at nominally the same rat as the (0001) face of the single crystal SiC.

  1. Formation of Novel Silicon Nitride with Face-Centered Cubic Crystal Structure in a TaN/Ta/Si(100) Thin Film System

    NASA Astrophysics Data System (ADS)

    Cheng, Wei-Chun; Jou, Shyan-Kay; Chiu, Chuei-Fu

    2005-07-01

    We discovered a new silicon nitride with cubic symmetry formed in the silicon at the Ta/Si interface of the TaN/Ta/Si(100) thin film system when the silicon wafer was annealed at 500 or 600°C. The cubic silicon nitride grew into the silicon crystal in the shape of an inverse pyramid after the annealing process. The boundary planes of the inverse pyramid were the \\{111\\} planes of the silicon crystal. The orientation relationship between the silicon nitride and silicon crystal is cubic to cubic. The lattice constant of the new silicon nitride is a=0.5548 nm and is about 2.2% larger than that of the silicon crystal.

  2. Thermo-Mechanical Optimization of a Gold Thick-film based SiC Die-attach Assembly using Finite Element Analysis

    NASA Technical Reports Server (NTRS)

    Lin, Shun-Tien; Chen, Liang-Yu

    2002-01-01

    A parametric study of the thermomechanical reliability of a Au thick-film based Sic-die- attach assembly using nonlinear finite element analysis (FEA) was conducted to optimize the die-attach thermo-mechanical performance for operation at temperatures from room temperature to 500 "C. This parametric study centered on material selection, structure design and process control. The die-attach assembly is composed of a 1 mm x 1 mm S i c die attached to a ceramic substrate (either 96% aluminum oxide (A1203) or aluminum nitride (AlN)) with a gold (Au) thick-film attach layer. The effects of die-size, Au attach layer thickness, substrate material, and stress relaxing temperature on the stress/strain distribution and relative fatigue lifetime of the die-attach assembly were numerically analyzed. By comparing the calculated permanent strain in the thick-film attach layer, FEA results indicate that AlN is superior to Al2O3. Thicker Au attach layers and smaller die sizes are recommended to reduce the permanent strain in thick-film die attach layer. Thicker S i c die also reduces the stress near the (top) surface region of the die. A stress relaxing temperature close to the midpoint of the operating temperature range further reduces the maximum stress/strain, thereby improving die-attach thermo-mechanical reliability. These recommendations present guidelines to optimize the thermo-mechanical performance of the die-attach assembly and are valid for a wide range of thermal environments.

  3. Pure Cubic-Phase Hybrid Iodobismuthates AgBi2 I7 for Thin-Film Photovoltaics.

    PubMed

    Kim, Younghoon; Yang, Zhenyu; Jain, Ankit; Voznyy, Oleksandr; Kim, Gi-Hwan; Liu, Min; Quan, Li Na; García de Arquer, F Pelayo; Comin, Riccardo; Fan, James Z; Sargent, Edward H

    2016-08-01

    Bismuth-based hybrid perovskites are candidates for lead-free and air-stable photovoltaics, but poor surface morphologies and a high band-gap energy have previously limited these hybrid perovskites. A new materials processing strategy to produce enhanced bismuth-based thin-film photovoltaic absorbers by incorporation of monovalent silver cations into iodobismuthates is presented. Solution-processed AgBi2 I7 thin films are prepared by spin-coating silver and bismuth precursors dissolved in n-butylamine and annealing under an N2 atmosphere. X-ray diffraction analysis reveals the pure cubic structure (Fd3m) with lattice parameters of a=b=c=12.223 Å. The resultant AgBi2 I7 thin films exhibit dense and pinhole-free surface morphologies with grains ranging in size from 200-800 nm and a low band gap of 1.87 eV suitable for photovoltaic applications. Initial studies produce solar power conversion efficiencies of 1.22 % and excellent stability over at least 10 days under ambient conditions. PMID:27355567

  4. Surface Transfer Doping of Cubic Boron Nitride Films by MoO3 and Tetrafluoro-tetracyanoquinodimethane (F4-TCNQ).

    PubMed

    He, Bin; Ng, Tsz-Wai; Lo, Ming-Fai; Lee, Chun-Sing; Zhang, Wenjun

    2015-05-13

    Cubic boron nitride (cBN) has strong potential for the applications in high-temperature and high-power electronics and deep ultraviolet devices due to its outstanding combined physical and chemical properties. P-type surface transfer doping of heteroepitaxial cBN films was achieved by employing MoO3 and tetrafluoro-tetracyanoquinodimethane (F4-TCNQ) as the surface dopants. The surface conductivities of hydrogenated cBN films increased by 3-6 orders after the deposition of surface dopants. The photoemission spectroscopy (PES) measurements revealed the variation of electronic structures at the interface regions, which suggested that the electron transfer from cBN films to the surface dopants induced hole accumulation at the cBN surface and the increase of surface conductivity. Based on the PES results, the energy level diagrams at MoO3/cBN and F4-TCNQ/cBN interfaces were determined. The achievement provided a potential approach for fabricating cBN-based electronic devices, especially on micrometer and nanometer scales. PMID:25915092

  5. Core-shell Si/C nanospheres embedded in bubble sheet-like carbon film with enhanced performance as lithium ion battery anodes.

    PubMed

    Li, Wenyue; Tang, Yongbing; Kang, Wenpei; Zhang, Zhenyu; Yang, Xia; Zhu, Yu; Zhang, Wenjun; Lee, Chun-Sing

    2015-03-18

    Due to its high theoretical capacity and low lithium insertion voltage plateau, silicon has been considered one of the most promising anodes for high energy and high power density lithium ion batteries (LIBs). However, its rapid capacity degradation, mainly caused by huge volume changes during lithium insertion/extraction processes, remains a significant challenge to its practical application. Engineering Si anodes with abundant free spaces and stabilizing them by incorporating carbon materials has been found to be effective to address the above problems. Using sodium chloride (NaCl) as a template, bubble sheet-like carbon film supported core-shell Si/C composites are prepared for the first time by a facile magnesium thermal reduction/glucose carbonization process. The capacity retention achieves up to 93.6% (about 1018 mAh g(-1)) after 200 cycles at 1 A g(-1). The good performance is attributed to synergistic effects of the conductive carbon film and the hollow structure of the core-shell nanospheres, which provide an ideal conductive matrix and buffer spaces for respectively electron transfer and Si expansion during lithiation process. This unique structure decreases the charge transfer resistance and suppresses the cracking/pulverization of Si, leading to the enhanced cycling performance of bubble sheet-like composite. PMID:25346141

  6. Tricontinuous Cubic Nanostructure and Pore Size Patterning in Mesostructured Silica Films Templated with Glycerol Monooleate

    PubMed Central

    Dunphy, Darren R.; Garcia, Fred L.; Kaehr, Bryan; Khripin, Constantine Y.; Collord, Andrew D.; Baca, Helen K.; Tate, Michael P.; Hillhouse, Hugh W.; Strzalka, Joseph W.; Jiang, Zhang; Wang, Jin; Brinker, C. Jeffrey

    2011-01-01

    The fabrication of nanostructured films possessing tricontinuous minimal surface mesophases with well-defined framework and pore connectivity remains a difficult task. As a new route to these structures, we introduce glycerol monooleate (GMO) as a template for evaporation-induced self-assembly. As deposited, a nanostructured double gyroid phase is formed, as indicated by analysis of grazing-incidence small-angle x-ray scattering data. Removal of GMO by UV/O3 treatment or acid extraction induces a phase change to a nanoporous body-centered structure which we tentatively identify as based on the IW-P surface. To improve film quality, we add a co-surfactant to the GMO in a mass ratio of 1:10; when this co-surfactant is cetyltrimethylammonium bromide, we find an unusually large pore size (8-12 nm) in acid extracted films, while UV/O3 treated films yield pores of only ca. 4 nm. Using this pore size dependence on film processing procedure, we create a simple method for patterning pore size in nanoporous films, demonstrating spatially-defined size-selective molecular adsorption. PMID:21572556

  7. Chemically deposited cubic structured CdO thin films: Room temperature

    NASA Astrophysics Data System (ADS)

    Bulakhe, R. N.; Lokhande, C. D.

    2013-06-01

    Cadmium oxide (CdO) thin films have been synthesized using a chemical bath deposition (CBD) method at room temperature. The prepared CdO thin film were annealed and further used for the structural, morphological, UVVIS characterization. The thermo emf study was made with the TEP setup. The structural study showed polycrystalline CdO material. Morphological study reveals the prism like morphology. Optical and thermo emf study showed n-type nature with optical band gap of 2.13 eV.

  8. Transparent conducting Si-codoped Al-doped ZnO thin films prepared by magnetron sputtering using Al-doped ZnO powder targets containing SiC

    SciTech Connect

    Nomoto, Jun-ichi; Miyata, Toshihiro; Minami, Tadatsugu

    2009-07-15

    Transparent conducting Al-doped ZnO (AZO) thin films codoped with Si, or Si-codoped AZO (AZO:Si), were prepared by radio-frequency magnetron sputtering using a powder mixture of ZnO, Al{sub 2}O{sub 3}, and SiC as the target; the Si content (Si/[Si+Zn] atomic ratio) was varied from 0 to 1 at. %, but the Al content (Al/[Al+Zn] atomic ratio) was held constant. To investigate the effect of carbon on the electrical properties of AZO:Si thin films prepared using the powder targets containing SiC, the authors also prepared thin films using a mixture of ZnO, Al{sub 2}O{sub 3}, and SiO{sub 2} or SiO powders as the target. They found that when AZO:Si thin films were deposited on glass substrates at about 200 degree sign C, both Al and Si doped into ZnO acted as effective donors and the atomic carbon originating from the sputtered target acted as a reducing agent. As a result, sufficient improvement was obtained in the spatial distribution of resistivity on the substrate surface in AZO:Si thin films prepared with a Si content (Si/[Si+Zn] atomic ratio) of 0.75 at. % using powder targets containing SiC. The improvement in resistivity distribution was mainly attributed to increases in both carrier concentration and Hall mobility at locations on the substrate corresponding to the target erosion region. In addition, the resistivity stability of AZO: Si thin films exposed to air for 30 min at a high temperature was found to improve with increasing Si content.

  9. Changes in characteristics of gadolinium, titanium, and erbium oxide films on the SiC surface under microwave treatment

    SciTech Connect

    Bacherikov, Yu. Yu.; Konakova, R. V.; Milenin, V. V.; Okhrimenko, O. B. Svetlichnyi, A. M.; Polyakov, V. V.

    2008-07-15

    The effect of microwaves on properties of Ti, Gd, and Er oxide films deposited on silicon carbide was studied using optical absorption and photoluminescence methods. The atomic composition of films was analyzed in relation to the microwave treatment time. It was shown that exposure to microwaves results in the appearance of an additional band in the photoluminescence spectra of the structures under study. It was shown that microwave treatment leads to an increase in the sample transmittance, which indicates an improvement in integrated characteristics of structures.

  10. Origin of magnetocrystalline anisotropy oscillations in (001) face-centred-cubic Co thin films and effect of sp d hybridization

    NASA Astrophysics Data System (ADS)

    Cinal, M.

    2003-01-01

    Magnetocrystalline anisotropy (MA) energy of (001) face-centred-cubic Co(N) films is calculated for film thicknesses N = 1-28 in a realistic tight-binding model with and without sp-d orbital hybridization included. The obtained results show that the average MA energy is not largely influenced by the sp-d hybridization. On the other hand, the oscillation pattern is remarkably changed when the sp-d hybridization is included: in this case the MA energy has oscillations with a clear period of 2 atomic layers (AL), similar to the previous ab initio calculations (Szunyogh L, Újfalussy B, Blaas C, Pustugova U, Sommers C and Weinberger P 1997 Phys. Rev. B 56 14036). A careful analysis in k- and N-spaces reveals that the total MA oscillations are a superposition of two oscillatory contributions: one coming from the neighbourhood of the barGamma-point with period close to 2 AL (regardless whether the sp-d hybridization is present or not) and the other originating in the region around the bar M-point. The bar M-point contribution has a larger period and its amplitude is significantly smaller than that of the barGamma-point contribution when the sp-d hybridization is included so that the 2 AL barGamma-point contribution is dominant in this case. The two oscillatory MA contributions are attributed to quantum-well states and the corresponding oscillation periods are related to the extremal radii of the minority-spin bulk Co Fermi surface.

  11. Chemical vapor deposition (CVD) of cubic silicon carbide. Patent Application

    SciTech Connect

    Addamiano, A.

    1985-07-02

    This invention relates to the growth of cubic silicon carbide crystals. More specifically, this invention relates to the growth of cubic silicon carbide by Chemical Vapor Deposition (CVD). One object of the present invention is to provide a novel method for the production of cubic SiC for high temperature electronic devices. Another object of the present invention is to provide a novel method for the production of highly pure, single crystal cubic SiC that is duplicable. Another object of the present invention is to provide a novel method for the production of large-area single-crystal wafers of cubic SiC. These and other objects of the present invention can be achieved by a method for chemical vapor deposition (CVD) of cubic Silicon Carbide (SiC) comprising the steps of etching silicon substrated having one mechanically polished face; depositing a thin buffer layer of cubic SiC formed by reaction between a heated Si substrate and a H2-C3H8 gas mixuture; and depositing SiC on the buffer layer at high temperature using H2+C3HY+SiH4 mixture.

  12. Transport Properties of Closely-Packed Carbon Nanotubes Film on SiC Tuned by Si-Doping

    NASA Astrophysics Data System (ADS)

    Norimatsu, Wataru; Maruyama, Takehiro; Yoshida, Kenta; Takase, Koichi; Kusunoki, Michiko

    2012-10-01

    Here, we reveal origins of the planar electrical transport of closely-packed carbon nanotubes (CNTs) and silicon-doped CNTs (Si-CNTs) films. Their electrical resistivities increased with decreasing temperature, but exhibit a plateau below 60 K. This phenomenon can be well described using the simple-two-band model, which is often used to understand the electronic properties of graphite. Cryogenic energy-filtered transmission electron microscopy visualizes Si atoms dispersed finely in CNTs, preserving the structural features of CNTs. These Si atoms induced effective carriers above 150 K, while three-dimensional variable range hopping and weak localization are dominant in their transport below 50 and 10 K, respectively.

  13. Cubic nitride templates

    DOEpatents

    Burrell, Anthony K; McCleskey, Thomas Mark; Jia, Quanxi; Mueller, Alexander H; Luo, Hongmei

    2013-04-30

    A polymer-assisted deposition process for deposition of epitaxial cubic metal nitride films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures under a suitable atmosphere to yield metal nitride films and the like. Such films can be used as templates for the development of high quality cubic GaN based electronic devices.

  14. Ion-beam-induced magnetic and structural phase transformation of Ni-stabilized face-centered-cubic Fe films on Cu(100)

    SciTech Connect

    Gloss, Jonas; Shah Zaman, Sameena; Jonner, Jakub; Novotny, Zbynek; Schmid, Michael; Varga, Peter; Urbánek, Michal

    2013-12-23

    Metastable face-centered cubic (fcc) Fe/Cu(100) thin films are good candidates for ion-beam magnetic patterning due to their magnetic transformation upon ion-beam irradiation. However, pure fcc Fe films undergo spontaneous transformation when their thickness exceeds 10 ML. This limit can be extended to approximately 22 ML by deposition of Fe at increased CO background pressures. We show that much thicker films can be grown by alloying with Ni for stabilizing the fcc γ phase. The amount of Ni necessary to stabilize nonmagnetic, transformable fcc Fe films in dependence on the residual background pressure during the deposition is determined and a phase diagram revealing the transformable region is presented.

  15. Formation of ZrO2 cubic phase microcrystals during crystallization of amorphous films deposited by laser ablation of Zr in an oxygen atmosphere

    NASA Astrophysics Data System (ADS)

    Bagmut, A. G.; Bagmut, I. A.; Reznik, N. A.

    2016-06-01

    The structure and phase transformations during annealing of zirconium dioxide films grown by pulsed laser sputtering of a Zr target in an oxygen atmosphere have been studied by transmission electron microscopy and electron diffraction methods. The conditions of the formation of both amorphous and cubic ZrO2 phases have been determined. The electron beam impact on the amorphous film in vacuum is accompanied by the formation of zirconium dioxide microcrystals with fcc lattice. The average grain size in the crystallized film is ˜0.5 μm. The phase transformation is accompanied by film material densification. The relative change in the density during ZrO2 crystallization is 10.27 ± 2.14%.

  16. Photonic Crystal Cavities in Cubic (3C) Silicon Carbide

    NASA Astrophysics Data System (ADS)

    Radulaski, Marina; Babinec, Thomas; Buckley, Sonia; Rundquist, Armand; Provine, J.; Alassaad, Kassem; Ferro, Gabriel; Vuckovic, Jelena

    2014-03-01

    Silicon carbide (SiC) combines many of the outstanding material properties of other well-known optical and quantum optical materials, including strong optical nonlinearity, high Young's modulus, and a host of optically-active crystalline defects, in a single CMOS-compatible platform. For many applications in classical and quantum information processing, the material properties of the cubic silicon carbide polytype (3C-SiC) in particular are advantageous. We therefore present the design, fabrication, and characterization of high quality factor and small mode volume planar photonic crystal cavities in cubic 3C-SiC thin films (200 nm). We demonstrate cavity resonances across the infrared telecommunications band, with wavelengths from 1.25 - 1.6 μm. Finally, we highlight our progress developing higher Q/V nanobeam cavities, as well as extending this optical cavity platform towards integration with SiC color centers. PECASE Grant ECCS-10 25811, NSF Grant ECS-9731293, Stanford Graduate Fellowship, National Science Graduate Fellowship.

  17. Synthesis, characterizations and applications of some nanomaterials (TiO2 and SiC nanostructured films, organized CNT structures, ZnO structures and CNT-blood platelet clusters)

    NASA Astrophysics Data System (ADS)

    Srivastava, O. N.; Srivastava, A.; Dash, D.; Singh, D. P.; Yadav, R. M.; Mishra, P. R.; Singh, J.

    2005-10-01

    TiO_{2} nanostructured films have been synthesized by the hydrolysis of Ti[OCH(CH_{3})_{2}]_{4} as the precursor. These films have been utilized for the dissociation of phenol contaminant in water. Free-standing nanostructured film of silicon carbide (SiC) has been synthesized, employing a simple and new route of spray pyrolysis technique utilizing a slurry of Si in hexane. Another study is done on organized carbon nanotube (CNT) structures. These are made in the form of hollow cylinders (50 mm length, 4 mm diameter and 1.5 mm wall thickness). These CNT-based cylinders are made of conventional CNT and bamboo-shaped CNT. The filtrations of heavy hydrocarbons and E. coli bacteria from water have been carried out. In addition to this, ZnO nanostructures have also been studied. Another study concerns CNT-blood platelet clusters.

  18. Stoichiometry dependent phase transition in Mn-Co-Ga-based thin films: From cubic in-plane, soft magnetized to tetragonal perpendicular, hard magnetized

    SciTech Connect

    Ouardi, Siham; Fecher, Gerhard H.; Stinshoff, Rolf; Felser, Claudia; Kubota, Takahide; Mizukami, Shigemi; Miyazaki, Terunobu; Ikenaga, Eiji

    2012-12-10

    Epitaxial thin films of Mn{sub 3-x}Co{sub x}Ga were grown on MgO by magnetron co-sputtering with different Co content. Dependent on the Co content tetragonal or cubic structures are obtained. The composition dependence of saturation magnetization M{sub S} and uniaxial magnetic anisotropy K{sub u} in the epitaxial films were investigated. A high magnetic anisotropy K{sub u} of 1.2 MJ m{sup -3} was achieved for the Mn{sub 2.6}Co{sub 0.3}Ga{sub 1.1} film with low magnetic moment of 0.84 {mu}{sub B}. The valence band spectra of the films were investigated mainly by hard x-ray photoelectron spectroscopy. The evidence of sharp states in the cubic case, which are smeared out in the tetragonal case, proof the existence of a van Hove singularity that causes a band Jahn-Teller effect accompanied by a tetragonal distortion. These differences are in well agreement to the ab-initio calculations of the electronic structure.

  19. The competitive growth of cubic domains in Ti(1-x)AlxN films studied by diffraction anomalous near-edge structure spectroscopy.

    PubMed

    Pinot, Y; Tuilier, M-H; Pac, M-J; Rousselot, C; Thiaudière, D

    2015-11-01

    Titanium and aluminium nitride films deposited by magnetron sputtering generally grow as columnar domains made of oriented nanocrystallites with cubic or hexagonal symmetry depending on Al content, which are embedded in more disordered grain boundaries. The substitution of Al atoms for Ti in the cubic lattice of the films improves their resistance to wear and oxidation, allowing their use as protective coatings. Ti K-edge X-ray absorption spectroscopy, which probes both crystallized and more disordered grain boundaries, and X-ray diffraction anomalous fine structure, which is sensitive to short- and long-range order within a given crystallized domain, are carried out on a set of Ti(1-x)AlxN films deposited by magnetron sputtering on Si substrates. Attention is paid to the shape of the pre-edge region, which is sensitive to the symmetry of the site occupied by Ti atoms, either octahedral in face-centred-cubic Ti-rich (TiN, Ti0.54Al0.46N) samples or tetrahedral in hexagonal-close-packed Al-rich (Ti0.32Al0.68N) films. In order to obain information on the titanium environment in the well crystallized areas, subtraction of the smooth part of the energy-dependent structure factor for the Bragg reflections is applied to the pre-edge region of the diffraction anomalous data in order to restore their spectroscopic appearance. A flat pre-edge is related to the typical octahedral environment of Ti atoms for cubic reflections. The difference observed between pre-edge spectra associated with face-centred-cubic 200 and 111 Bragg reflections of Ti0.54Al0.46N is assigned to Ti enrichment of 111 large well ordered domains compared with the more disordered 200 ones. The sharp peak observed in the spectrum recorded from the hexagonal 002 peak of Ti0.32Al0.68N can be regarded as a standard for the pure tetrahedral Ti environment in hexagonal-close-packed nitride. PMID:26524309

  20. Corrosion pitting of SiC by molten salts

    NASA Technical Reports Server (NTRS)

    Jacobson, N. S.; Smialek, J. L.

    1986-01-01

    The corrosion of SiC by thin films of Na2CO3 and Na2SO4 at 1000 C is characterized by a severe pitting attack of the SiC substrate. A range of different Si and SiC substrates were examined to isolate the factors critical to pitting. Two types of pitting attack are identified: attack at structural discontinuities and a crater-like attack. The crater-like pits are correlated with bubble formation during oxidation of the SiC. It appears that bubbles create unprotected regions, which are susceptible to enhanced attack and, hence, pit formation.

  1. Postdeposition annealing induced transition from hexagonal Pr{sub 2}O{sub 3} to cubic PrO{sub 2} films on Si(111)

    SciTech Connect

    Weisemoeller, T.; Bertram, F.; Gevers, S.; Greuling, A.; Deiter, C.; Tobergte, H.; Neumann, M.; Wollschlaeger, J.; Giussani, A.; Schroeder, T.

    2009-06-15

    Films of hexagonal praseodymium sesquioxide (h-Pr{sub 2}O{sub 3}) were deposited on Si(111) by molecular beam epitaxy and thereafter annealed in 1 atm oxygen at different temperatures, ranging from 100 to 700 deg. C. The films of the samples annealed at 300 deg. C or more were transformed to PrO{sub 2} with B-oriented Fm3m structure, while films annealed at lower temperatures kept the hexagonal structure. The films are composed of PrO{sub 2} and PrO{sub 2-d}elta species, which coexist laterally and are tetragonally distorted due to the interaction at the interface between oxide film and Si substrate. Compared to PrO{sub 2}, PrO{sub 2-d}elta has the same cubic structure but with oxygen vacancies. The oxygen vacancies are partly ordered and increase the vertical lattice constant of the film, whereas the lateral lattice constant is almost identical for both species and on all samples. The latter lattice constant matches the lattice constant of the originally crystallized hexagonal praseodymium sesquioxide. That means that no long range reordering of the praseodymium atoms takes place during the phase transformation.

  2. Phenomenological theory of phase transitions in epitaxial BaxSr1-xTiO3 thin films on (111)-oriented cubic substrates

    NASA Astrophysics Data System (ADS)

    Shirokov, V. B.; Shakhovoy, R. A.; Razumnaya, A. G.; Yuzyuk, Yu. I.

    2015-07-01

    A phenomenological thermodynamic theory of BaxSr1-xTiO3 (BST-x) thin films epitaxially grown on (111)-oriented cubic substrates is developed using the Landau-Devonshire approach. The group-theoretical analysis of the low-symmetry phases was performed taking into account two order parameters: the polarization related to ionic shifts in polar zone-center F1u mode and the out-of-phase rotation of TiO6 octahedra corresponding to the R25 zone-boundary mode in the parent cubic phase P m 3 ¯ m . The eight-order thermodynamic potential for BST-x solid solutions was developed and analyzed. We constructed the "concentration-misfit strain" phase diagram for BST-x thin films at room temperature and found that polar rhombohedral R3m phase with the polarization normal to the substrate is stable for x > 0.72 and negative misfit strains, while ferroelectric monoclinic C2 and Cm phases with in-plane polarization are stable for much smaller x and positive or slightly negative misfit strains. We constructed the "temperature-misfit strain" phase diagrams for several concentrations (x = 1, 0.8, 0.6, 0.4, and 0.2). Systematic changes of the phase transition lines between the paraelectric and ferroelectric phases are discussed. The phase diagrams are useful for practical applications in thin-film engineering.

  3. Atomistic mechanisms of strain relaxation due to ductile void growth in ultrathin films of face-centered-cubic metals

    NASA Astrophysics Data System (ADS)

    Gungor, M. Rauf; Maroudas, Dimitrios

    2005-06-01

    A comprehensive computational analysis is reported of the atomistic mechanisms of strain relaxation and failure in free-standing Cu thin films under applied biaxial tensile strain for strain levels up to 6%. The analysis focuses on nanometer-scale-thick films with a preexisting void extending across the film thickness and the film plane oriented normal to the [111] crystallographic direction. Our computational study is based on isothermal-isostrain large-scale molecular-dynamics simulations within an embedded-atom-method parametrization for Cu. Our analysis has revealed various regimes in the film's mechanical response as the applied strain level increases. Within the considered strain range, after an elastic response at a low strain (<2%), void growth is the major strain relaxation mechanism mediated by the emission of perfect screw dislocation pairs from the void surface and subsequent dislocation propagation; as a result, a plastic zone forms around the void. Plastic deformation is accompanied by the glide motion of the dislocations emitted from the void surface, void surface morphological transitions, formation of a step pattern on the film's surfaces, dislocation jogging, vacancy generation due to gliding jogged dislocations, dislocation-vacancy interactions, vacancy pipe diffusion along dislocation cores, as well as dislocation-dislocation interactions. The increase in film surface roughness with increasing strain eventually leads to nucleation and propagation from the film surfaces of threading dislocation loops, which ultimately break up when they reach the opposite free surface of the thin film.

  4. -SiC Composites

    NASA Astrophysics Data System (ADS)

    Chakraborty, Shirshendu; Debnath, Debashish; Mallick, Azizur Rahaman; Das, Probal Kumar

    2014-12-01

    ZrB2-SiC composites were hot pressed at 2473 K (2200 °C) with graded amounts (5 to 20 wt pct) of SiC and the effect of the SiC addition on mechanical properties like hardness, fracture toughness, scratch and wear resistances, and thermal conductivity were studied. Addition of submicron-sized SiC particles in ZrB2 matrices enhanced mechanical properties like hardness (15.6 to 19.1 GPa at 1 kgf), fracture toughness (2 to 3.6 MPa(m)1/2) by second phase dispersion toughening mechanism, and also improved scratch and wear resistances. Thermal conductivity of ZrB2-SiC (5 wt pct) composite was higher [121 to 93 W/m K from 373 K to 1273 K (100 °C to 1000 °C)] and decreased slowly upto 1273 K (1000 °C) in comparison to monolithic ZrB2 providing better resistance to thermal fluctuation of the composite and improved service life in UHTC applications. At higher loading of SiC (15 wt pct and above), increased thermal barrier at the grain boundaries probably reduced the thermal conductivity of the composite.

  5. SiC Technology

    NASA Technical Reports Server (NTRS)

    Neudeck, Philip G.

    1998-01-01

    Silicon carbide (SiC)-based semiconductor electronic devices and circuits are presently being developed for use in high-temperature, high-power, and/or high-radiation conditions under which conventional semiconductors cannot adequately perform. Silicon carbide's ability to function under such extreme conditions is expected to enable significant improvements to a far-ranging variety of applications and systems. These range from greatly improved high-voltage switching [1- 4] for energy savings in public electric power distribution and electric motor drives to more powerful microwave electronics for radar and communications [5-7] to sensors and controls for cleaner-burning more fuel-efficient jet aircraft and automobile engines. In the particular area of power devices, theoretical appraisals have indicated that SiC power MOSFET's and diode rectifiers would operate over higher voltage and temperature ranges, have superior switching characteristics, and yet have die sizes nearly 20 times smaller than correspondingly rated silicon-based devices [8]. However, these tremendous theoretical advantages have yet to be realized in experimental SiC devices, primarily due to the fact that SiC's relatively immature crystal growth and device fabrication technologies are not yet sufficiently developed to the degree required for reliable incorporation into most electronic systems [9]. This chapter briefly surveys the SiC semiconductor electronics technology. In particular, the differences (both good and bad) between SiC electronics technology and well-known silicon VLSI technology are highlighted. Projected performance benefits of SiC electronics are highlighted for several large-scale applications. Key crystal growth and device-fabrication issues that presently limit the performance and capability of high temperature and/or high power SiC electronics are identified.

  6. Bare and boron-doped cubic silicon carbide nanowires for electrochemical detection of nitrite sensitively

    NASA Astrophysics Data System (ADS)

    Yang, Tao; Zhang, Liqin; Hou, Xinmei; Chen, Junhong; Chou, Kuo-Chih

    2016-04-01

    Fabrication of eletrochemical sensors based on wide bandgap compound semiconductors has attracted increasing interest in recent years. Here we report for the first time electrochemical nitrite sensors based on cubic silicon carbide (SiC) nanowires (NWs) with smooth surface and boron-doped cubic SiC NWs with fin-like structure. Multiple techniques including scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and electron energy loss spectroscopy (EELS) were used to characterize SiC and boron-doped SiC NWs. As for the electrochemical behavior of both SiC NWs electrode, the cyclic voltammetric results show that both SiC electrodes exhibit wide potential window and excellent electrocatalytic activity toward nitrite oxidation. Differential pulse voltammetry (DPV) determination reveals that there exists a good linear relationship between the oxidation peak current and the concentration in the range of 50–15000 μmoL L‑1 (cubic SiC NWs) and 5–8000 μmoL L‑1 (B-doped cubic SiC NWs) with the detection limitation of 5 and 0.5 μmoL L‑1 respectively. Compared with previously reported results, both as-prepared nitrite sensors exhibit wider linear response range with comparable high sensitivity, high stability and reproducibility.

  7. Bare and boron-doped cubic silicon carbide nanowires for electrochemical detection of nitrite sensitively

    PubMed Central

    Yang, Tao; Zhang, Liqin; Hou, Xinmei; Chen, Junhong; Chou, Kuo-Chih

    2016-01-01

    Fabrication of eletrochemical sensors based on wide bandgap compound semiconductors has attracted increasing interest in recent years. Here we report for the first time electrochemical nitrite sensors based on cubic silicon carbide (SiC) nanowires (NWs) with smooth surface and boron-doped cubic SiC NWs with fin-like structure. Multiple techniques including scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and electron energy loss spectroscopy (EELS) were used to characterize SiC and boron-doped SiC NWs. As for the electrochemical behavior of both SiC NWs electrode, the cyclic voltammetric results show that both SiC electrodes exhibit wide potential window and excellent electrocatalytic activity toward nitrite oxidation. Differential pulse voltammetry (DPV) determination reveals that there exists a good linear relationship between the oxidation peak current and the concentration in the range of 50–15000 μmoL L−1 (cubic SiC NWs) and 5–8000 μmoL L−1 (B-doped cubic SiC NWs) with the detection limitation of 5 and 0.5 μmoL L−1 respectively. Compared with previously reported results, both as-prepared nitrite sensors exhibit wider linear response range with comparable high sensitivity, high stability and reproducibility. PMID:27109361

  8. Bare and boron-doped cubic silicon carbide nanowires for electrochemical detection of nitrite sensitively.

    PubMed

    Yang, Tao; Zhang, Liqin; Hou, Xinmei; Chen, Junhong; Chou, Kuo-Chih

    2016-01-01

    Fabrication of eletrochemical sensors based on wide bandgap compound semiconductors has attracted increasing interest in recent years. Here we report for the first time electrochemical nitrite sensors based on cubic silicon carbide (SiC) nanowires (NWs) with smooth surface and boron-doped cubic SiC NWs with fin-like structure. Multiple techniques including scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and electron energy loss spectroscopy (EELS) were used to characterize SiC and boron-doped SiC NWs. As for the electrochemical behavior of both SiC NWs electrode, the cyclic voltammetric results show that both SiC electrodes exhibit wide potential window and excellent electrocatalytic activity toward nitrite oxidation. Differential pulse voltammetry (DPV) determination reveals that there exists a good linear relationship between the oxidation peak current and the concentration in the range of 50-15000 μmoL L(-1) (cubic SiC NWs) and 5-8000 μmoL L(-1) (B-doped cubic SiC NWs) with the detection limitation of 5 and 0.5 μmoL L(-1) respectively. Compared with previously reported results, both as-prepared nitrite sensors exhibit wider linear response range with comparable high sensitivity, high stability and reproducibility. PMID:27109361

  9. Ionic Conductivity of Mesostructured Yttria-Stabilized Zirconia Thin Films with Cubic Pore Symmetry—On the Influence of Water on the Surface Oxygen Ion Transport.

    PubMed

    Elm, Matthias T; Hofmann, Jonas D; Suchomski, Christian; Janek, Jürgen; Brezesinski, Torsten

    2015-06-10

    Thermally stable, ordered mesoporous thin films of 8 mol % yttria-stabilized zirconia (YSZ) were prepared by solution-phase coassembly of chloride salt precursors with an amphiphilic diblock copolymer using an evaporation-induced self-assembly process. The resulting material is of high quality and exhibits a well-defined three-dimensional network of pores averaging 24 nm in diameter after annealing at 600 °C for several hours. The wall structure is polycrystalline, with grains in the size range of 7 to 10 nm. Using impedance spectroscopy, the total electrical conductivity was measured between 200 and 500 °C under ambient atmosphere as well as in dry atmosphere for oxygen partial pressures ranging from 1 to 10(-4) bar. Similar to bulk YSZ, a constant ionic conductivity is observed over the whole oxygen partial pressure range investigated. In dry atmosphere, the sol-gel derived films have a much higher conductivity, with different activation energies for low and high temperatures. Overall, the results indicate a strong influence of the surface on the transport properties in cubic fluorite-type YSZ with high surface-to-volume ratio. A qualitative defect model which includes surface effects (annihilation of oxygen vacancies as a result of water adsorption) is proposed to explain the behavior and sensitivity of the conductivity to variations in the surrounding atmosphere. PMID:25984884

  10. Suppression of ferromagnetism and observation of quantum well states in epitaxial thin films of the cubic ruthenate BaRuO3

    NASA Astrophysics Data System (ADS)

    Burganov, Bulat; Paik, Hanjong; Shen, Kyle; Schlom, Darrell

    The pseudocubic perovskite ruthenates ARuO3, where A is alkaline earth metal, are correlated materials where Hund's coupling drives correlations and leads to a low coherence scale, large renormalization, and formation of local moments. The ferromagnetic BaRuO3 has an ideal cubic structure and a larger bandwidth, compared to its GdFeO3-distorted counterparts, CaRuO3 and SrRuO3. In stark contrast to SrRuO3, which is a Fermi liquid below TC, BaRuO3 exhibits critical fluctuations near TC that are enhanced under hydrostatic pressure, which suppresses the Fermi liquid coherence scale and TC and drives a crossover into non-FL regime. Here we use ARPES to characterize the momentum-resolved electronic structure of strained ultrathin BaRuO3 films grown in situ by molecular beam epitaxy. The films on STO (001) are metallic down to 2 u.c. thickness and manifest clearly defined subbands of well-defined quasiparticles which arise due to quantum confinement effects. We observe that the bands are moderately renormalized compared to bare GGA bands and discover that the ferromagnetism can be suppressed in the atomically thin limit. We discuss our results on BaRuO3 in the context of our recent ARPES studies of the other perovskite ruthenates, SrRuO3 and CaRuO3.

  11. Thermal expansion and thermal expansion anisotropy of SiC polytypes

    NASA Technical Reports Server (NTRS)

    Li, Z.; Bradt, R. C.

    1987-01-01

    The principal axial coefficients of thermal expansion for the (3C), (4H), and (6H) polytypes of SiC are considered to identify the structural role of the stacking layer sequence as it affects the thermal expansion. A general equation based on the fractions of cubic and hexagonal layer stacking is developed that expresses the principal axial thermal expansion coefficients of all of the SiC polytypes. It is then applied to address the thermal expansion anisotropy of the noncubic SiC structures.

  12. SiC protective coating for photovoltaic retinal prosthesis

    NASA Astrophysics Data System (ADS)

    Lei, Xin; Kane, Sheryl; Cogan, Stuart; Lorach, Henri; Galambos, Ludwig; Huie, Philip; Mathieson, Keith; Kamins, Theodore; Harris, James; Palanker, Daniel

    2016-08-01

    Objective. To evaluate plasma-enhanced, chemically vapor deposited (PECVD) amorphous silicon carbide (α-SiC:H) as a protective coating for retinal prostheses and other implantable devices, and to study their failure mechanisms in vivo. Approach. Retinal prostheses were implanted in rats sub-retinally for up to 1 year. Degradation of implants was characterized by optical and scanning electron microscopy. Dissolution rates of SiC, SiN x and thermal SiO2 were measured in accelerated soaking tests in saline at 87 °C. Defects in SiC films were revealed and analyzed by selectively removing the materials underneath those defects. Main results. At 87 °C SiN x dissolved at 18.3 ± 0.3 nm d‑1, while SiO2 grown at high temperature (1000 °C) dissolved at 0.104 ± 0.008 nm d‑1. SiC films demonstrated the best stability, with no quantifiable change after 112 d. Defects in thin SiC films appeared primarily over complicated topography and rough surfaces. Significance. SiC coatings demonstrating no erosion in accelerated aging test for 112 d at 87 °C, equivalent to about 10 years in vivo, can offer effective protection of the implants. Photovoltaic retinal prostheses with PECVD SiC coatings exhibited effective protection from erosion during the 4 month follow-up in vivo. The optimal thickness of SiC layers is about 560 nm, as defined by anti-reflective properties and by sufficient coverage to eliminate defects.

  13. Stress Analysis of SiC MEMS Using Raman Spectroscopy

    NASA Astrophysics Data System (ADS)

    Ness, Stanley J.; Marciniak, M. A.; Lott, J. A.; Starman, L. A.; Busbee, J. D.; Melzak, J. M.

    2003-03-01

    During the fabrication of Micro-Electro-Mechanical Systems (MEMS), residual stress is often induced in the thin films that are deposited to create these systems. These stresses can cause the device to fail due to buckling, curling, or fracture. Industry is looking for ways to characterize the stress during the deposition of thin films in order to reduce or eliminate device failure. Micro-Raman spectroscopy has been successfully used to characterize poly-Si MEMS devices made with the MUMPS® process. Raman spectroscopy was selected because it is nondestructive, fast and has the potential for in situ stress monitoring. This research attempts to use Raman spectroscopy to analyze the stress in SiC MEMS made with the MUSiC® process. Raman spectroscopy is performed on 1-2-micron-thick SiC thin films deposited on silicon, silicon nitride, and silicon oxide substrates. The most common poly-type of SiC found in thin film MEMS made with the MUSiC® process is 3C-SiC. Research also includes baseline spectra of 6H, 4H, and 15R poly-types of bulk SiC.

  14. Symmetry-broken double fingers and seaweed patterns in thin-film directional solidification of a nonfaceted cubic crystal

    NASA Astrophysics Data System (ADS)

    Akamatsu, Silvère; Faivre, Gabriel; Ihle, Thomas

    1995-05-01

    We present a detailed experimental and numerical investigation of the directional-solidification growth patterns in thin films of the CBr4-8 mol % C2Cl6 alloy, as a function of the orientation of the (fcc) crystal with respect to the solidification setup. Most experiments are performed with single-crystal samples about 10 mm wide and 15 μm thick. The crystal sometimes contains small faceted gas inclusions, the shape of which gives us direct information about the orientation of the crystal. Numerical simulations by a fully dynamical method are carried out with parameters corresponding to the experimental system. We find experimentally that, in crystals with a \\{111\\} plane (nearly) parallel to the plane of the thin film, the growth pattern is nondendritic and unsteady over the explored velocity range (5Vc-50Vc Vc~=1.9 μm s-1 is the cellular threshold velocity). By studying the time evolution of this pattern, we establish that it is essentially similar to the ``seaweed pattern'' characteristic of vanishingly small capillary and kinetic anisotropies of the solid-liquid interface, recently studied numerically [T. Ihle and H. Müller-Krumbhaar, Phys. Rev. E 49, 2972 (1994)]. The building blocks of this pattern are local structures-pairs of symmetry-broken (SB) fingers called ``SB double fingers'' or ``doublons,'' and more complex structures called ``multiplets''-whose lifetime is long but finite. We show experimentally that, in agreement with numerical findings, doublons obey selection rules, but do not have a preferential growth direction. We furthermore find that ``dendritic'' doublons also appear in crystals with a <100> axis close to the pulling direction (thus having a strong two-dimensional anisotropy) above a critical velocity (~=20Vc). The existence and stability of dendritic doublons in directional solidification at high velocity are confirmed by the simulations. Another crystal orientation of interest is that in which two <100> axes are symmetrically

  15. Sputter deposition of SiC coating on silicon wafers

    NASA Technical Reports Server (NTRS)

    Robson, M. T.; Blue, C. A.; Warrier, S. G.; Lin, R. Y.

    1992-01-01

    A study is conducted of the effect of substrate temperature during coating on the properties of coated SiC films on Si wafers, using a scratch test technique. While specimen temperature during coating has little effect on deposition rate, it significantly affects the durability of the coating. Scratch test damage to both film coating and substrate decreased with increasing deposition temperature, perhaps due to the rapid diffusion of the deposited atoms.

  16. Structural and chemical analysis of pulsed laser deposited Mg xZn 1- xO hexagonal ( x = 0.15, 0.28) and cubic ( x = 0.85) thin films

    NASA Astrophysics Data System (ADS)

    Hullavarad, S. S.; Hullavarad, N. V.; Pugel, D. E.; Dhar, S.; Venkatesan, T.; Vispute, R. D.

    2008-02-01

    Hexagonal and cubic Mg xZn 1- xO thin films corresponding to optical band gaps of 3.52 eV, 4 eV and 6.42 eV for x = 0.15, 0.28 and 0.85 compositions were grown by pulsed laser deposition technique. The crystalline quality of the films was investigated by X-ray diffraction-rocking curve measurements and indicated a high degree of crystallinity with narrow FWHM's of 0.21°-0.59°. Rutherford back scattering-channeling spectroscopy provides channeling yields of 7-14% indicating the good crystalline quality of the thin films. X-Ray photoelectron spectroscopy measurements clearly indicated different level of oxidation states of Mg and Zn.

  17. Microstructure characterization of SiC nanowires as reinforcements in composites

    SciTech Connect

    Dong, Ronghua; Yang, Wenshu; Wu, Ping; Hussain, Murid; Xiu, Ziyang; Wu, Gaohui; Wang, Pingping

    2015-05-15

    SiC nanowires have been rarely investigated or explored along their axial direction by transmission electron microscopy (TEM). Here we report the investigation of the cross-section microstructure of SiC nanowires by embedding them into Al matrix. Morphology of SiC nanowires was cylindrical with smooth surface or bamboo shape. Cubic (3C-SiC) and hexagonal structure (2H-SiC) phases were detected by X-ray diffraction (XRD) analysis. High density stacking faults were observed in both the cylindrical and bamboo shaped nanowires which were perpendicular to their axial direction. Selected area electron diffraction (SAED) patterns of the cylindrical and bamboo shaped SiC nanowires both in the perpendicular and parallel direction to the axial direction were equivalent in the structure. After calculation and remodeling, it has been found that the SAED patterns were composed of two sets of diffraction patterns, corresponding to 2H-SiC and 3C-SiC, respectively. Therefore, it could be concluded that the SiC nanowires are composed of a large number of small fragments that are formed by hybrid 3C-SiC and 2H-SiC structures. - Graphical abstract: Display Omitted - Highlights: • Cross-section microstructure of SiC nanowires was observed in Al composite. • Cylindrical with smooth surface or bamboo shape SiC nanowires were found. • The cylindrical and bamboo shaped SiC nanowires were equivalent in structure. • Structure of SiC nanowires was remodeled. • SiC nanowires are composed of hybrid 3C-SiC and 2H-SiC structures.

  18. Hysteresis in the Active Oxidation of SiC

    NASA Technical Reports Server (NTRS)

    Jacobson, Nathan S.; Harder, Bryan J.; Myers, Dwight L.

    2011-01-01

    Si and SiC show both passive oxidation behavior where a protective film of SiO2 forms and active oxidation behavior where a volatile suboxide SiO(g) forms. The active-to-passive and passive-to-active oxidation transitions are explored for both Si and SiC. Si shows a dramatic difference between the P(O2) for the two transitions of 10-4 bar. The active-to-passive transition is controlled by the condition for SiO2/Si equilibrium and the passive-to-active transition is controlled by the decomposition of SiO2. In the case of SiC, the P(O2) for these transitions are much closer. The active-to-passive transition appears to be controlled by the condition for SiO2/SiC equilibrium. The passive-to-active transition appears to be controlled by the interfacial reaction of SiC and SiO2 and subsequent generation of gases at the interface which leads to scale breakdown.

  19. Active Oxidation of SiC

    NASA Technical Reports Server (NTRS)

    Jacobson, Nathan S.; Myers,Dwight L.; Harder, Bryan J.

    2011-01-01

    The high temperature oxidation of silicon carbide occurs in either a passive or active mode, depending on temperature and oxygen potential. Passive oxidation forms a protective oxide film which limits attack of the SiC:SiC(s) + 3/2 O2(g) = SiO2(s) + CO(g.) Active oxidation forms a volatile oxide and leads to extensive attack of the SiC: SiC(s) + O2(g) = SiO(g) + CO(g). The transition points and rates of active oxidation are a major issue. Previous studies are reviewed and the leading theories of passive/active transitions summarized. Comparisons are made to the active/passive transitions in pure Si, which are relatively well-understood. Critical questions remain about the difference between the active-to-passive transition and passive-to-active transition. For Si, Wagner [2] points out that the active-to-passive transition is governed by the criterion for a stable Si/SiO2 equilibria and the passive-to-active transition is governed by the decomposition of the SiO2 film. This suggests a significant oxygen potential difference between these two transitions and our experiments confirm this. For Si, the initial stages of active oxidation are characterized by the formation of SiO(g) and further oxidation to SiO2(s) as micron-sized rods, with a distinctive morphology. SiC shows significant differences. The active-to-passive and the passive-to-active transitions are close. The SiO2 rods only appear as the passive film breaks down. These differences are explained in terms of the reactions at the SiC/SiO2 interface. In order to understand the breakdown of the passive film, pre-oxidation experiments are conducted. These involve forming dense protective scales of 0.5, 1, and 2 microns and then subjecting the samples with these scales to a known active oxidation environment. Microstructural studies show that SiC/SiO2 interfacial reactions lead to a breakdown of the scale with a distinct morphology.

  20. Process for the homoepitaxial growth of single-crystal silicon carbide films on silicon carbide wafers

    NASA Technical Reports Server (NTRS)

    Powell, J. Anthony (Inventor)

    1993-01-01

    The invention is a method for growing homoepitaxial films of SiC on low tilt angle vicinal (0001) SiC wafers. The invention proposes and teaches a new theoretical model for the homoepitaxial growth of SiC films on (0001) SiC substrates. The inventive method consists of preparing the growth surface of SiC wafers slightly off-axis (from less the 0.1 to 6 deg) from the (0001) plane, subjecting the growth surface to a suitable etch, and then growing the homoepitaxial film using conventional SiC growth techniques.

  1. Application of rapid milling technology for fabrication of SiC nanoparticles.

    PubMed

    Kim, Jong-Woong; Shim, Jae-Shik; Kwak, Min-Gi; Hong, Sung-Jei; Cho, Hyun-Min

    2013-09-01

    SiC nanoparticles were successfully fabricated by a high energy ball milling method, so that can be used in the printed electronics to make SiC thin film patterns. Here we utilized the waste of Si sludge for making the SiC nanoparticles. In order to achieve uniform thin film from the nanoparticle ink, fine sized SiC nanoparticles less than 100 nm has to be uniformly dispersed. In this study, we employed the ultra apex milling (UAM) system for particle comminution and dispersion. We investigated the effects of milling parameters, e.g., size of ZrO2 bead and milling time. The size of the SiC particles reached about 103 nm after 4 hours of UAM, when the ZrO2 beads of 50 microm were used. Then SiC ink was formulated with organic solvents and a dispersing agent. A specially designed pattern was printed by an ink-jet printer for evaluating the feasibility of the SiC nanoparticle inks. PMID:24205600

  2. Atomistic aspects of ductile responses of cubic silicon carbide during nanometric cutting

    PubMed Central

    2011-01-01

    Cubic silicon carbide (SiC) is an extremely hard and brittle material having unique blend of material properties which makes it suitable candidate for microelectromechanical systems and nanoelectromechanical systems applications. Although, SiC can be machined in ductile regime at nanoscale through single-point diamond turning process, the root cause of the ductile response of SiC has not been understood yet which impedes significant exploitation of this ceramic material. In this paper, molecular dynamics simulation has been carried out to investigate the atomistic aspects of ductile response of SiC during nanometric cutting process. Simulation results show that cubic SiC undergoes sp3-sp2 order-disorder transition resulting in the formation of SiC-graphene-like substance with a growth rate dependent on the cutting conditions. The disorder transition of SiC causes the ductile response during its nanometric cutting operations. It was further found out that the continuous abrasive action between the diamond tool and SiC causes simultaneous sp3-sp2 order-disorder transition of diamond tool which results in graphitization of diamond and consequent tool wear. PMID:22078069

  3. Optical waveguide formed by cubic silicon carbide on sapphire substrates

    NASA Technical Reports Server (NTRS)

    Tang, Xiao; Wongchotigul, Kobchat; Spencer, Michael G.

    1991-01-01

    Optical confinement in beta silicon carbide (beta-SiC) thin films on sapphire substrate is demonstrated. Measurements are performed on waveguides formed by the mechanical transfer of thin beta-SiC films to sapphire. Recent results of epitaxial films of SiC on sapphire substrates attest to the technological viability of optoelectronic devices made from silicon carbide. Far-field mode patterns are shown. It is believed that this is the first step in validating a silicon carbide optoelectronic technology.

  4. Optimizing Graphene Morphology on SiC(0001)

    NASA Astrophysics Data System (ADS)

    Hannon, James

    2009-03-01

    Many schemes to integrate graphene with microelectronics assume that reliable wafer-scale synthesis processes will be developed. One promising route to wafer-scale synthesis is to form graphene overlayers from the decomposition of SiC at high temperature. We have shown that, even at 1200 C, limited diffusion at the SiC surface leads to pit formation and a non-uniform graphene film thickness [1]. In this talk I will describe our efforts to improve both graphene domain size and thickness uniformity. One way we achieve this is by forming graphene in a background pressure of disilane, which hinders SiC decomposition. Even in rather low Si partial pressures (e.g. 1e-5 Torr), the SiC decomposition temperature can shifted several hundred degrees higher in temperature [2]. Using in situ low-energy electron microscopy (LEEM), we show that this effect can be exploited to form large graphene domains (larger than 10 um) with controlled layer thickness (e.g. 1 ML). Work performed in collaboration with R.M. Tromp. [4pt] [1] J.B. Hannon and R.M. Tromp, Phys. Rev. B77, 241404(R) 2008[0pt] [2] R.M. Tromp and J.B. Hannon, in press.

  5. -SiC nanocomposite coatings synthesized by co-electrodeposition

    NASA Astrophysics Data System (ADS)

    Masoudi, Mehran; Hashim, Mansor; Kamari, Halimah Mohamed

    2014-08-01

    In the present work, Ni-Al2O3, Ni-SiC and novel Ni-Al2O3-SiC metal matrix composite (MMC) coatings were electrodeposited onto pure copper samples using a modified Watt's nickel electroplating bath containing nano alumina and silicon carbide particles with an average particle size of 50 nm. The composition, crystalline structure and surface morphology of the deposits were characterized by X-ray diffractometry (XRD), energy-dispersive X-ray spectroscopy (EDS) and field emission scanning electron microscopy (FESEM). The results indicated that Ni-Al2O3-SiC hybrid composite films with an acceptable homogeneity and granular structure having 9.2 and 7.7 % vol. Al2O3 and SiC nanoparticles, respectively were developed successfully. The nanoparticles incorporated in the nickel layer effectively increased the micro hardness and wear resistance owing to dispersion and grain-refinement strengthening, changing the nickel matrix morphology as well as the texture and preferred grain growth direction from <100> to the close-packed <111>. The oxidation resistance of the Ni-Al2O3-SiC hybrid composite coatings was measured to be approximately 41 % greater than the unreinforced Ni deposit and almost 30 % better than the Ni-Al2O3 composite coatings.

  6. Low damage, highly anisotropic dry etching of SiC

    SciTech Connect

    Wang, J.J.; Hong, J.; Lambers, E.S.; Pearton, S.J.; Ren, F.; Ostling, M.; Zetterling, C.M.; Grow, J.M.; Shul, R.J.

    1998-03-01

    A parametric study of the etching characteristics of 6H p{sup +} and n{sup +} SiC and thin film SiC{sub 0.5}N{sub 0.5} in Inductively Coupled Plasma NF{sub 3}/O{sub 2} and NF{sub 3}/Ar discharges has been performed. The etch rates in both chemistries increase monotonically with NF{sub 3} percentage and rf chuck power. The etch rates go through a maximum with increasing ICP source power, which is explained by a trade-off between the increasing ion flux and the decreasing ion energy. The anisotropy of the etched features is also a function of ion flux, ion energy and atomic fluorine neutral concentration. Indium-tin-oxide (ITO) masks display relatively good etch selectivity over SiC (maximum of {approximately} 70:1), while photoresist etches more rapidly than SiC. The surface roughness of SiC is essentially independent of plasma composition for NF3/O2 discharges, while extensive surface degradation occurs for SiCN under high NF{sub 3}:O{sub 2} conditions.

  7. 29 CFR 510.21 - SIC codes.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... reference was approved by the Director of the Federal Register in accordance with 5 U.S.C. 552(a) and 1 CFR... in that census are organized by Standard Industrial Classification (SIC), the statistical... (SIC) code level.” (b) The Standard Industrial Classification (SIC) codes listed in appendix A and...

  8. Pd/CeO2/SiC Chemical Sensors

    NASA Technical Reports Server (NTRS)

    Lu, Weijie; Collins, W. Eugene

    2005-01-01

    The incorporation of nanostructured interfacial layers of CeO2 has been proposed to enhance the performances of Pd/SiC Schottky diodes used to sense hydrogen and hydrocarbons at high temperatures. If successful, this development could prove beneficial in numerous applications in which there are requirements to sense hydrogen and hydrocarbons at high temperatures: examples include monitoring of exhaust gases from engines and detecting fires. Sensitivity and thermal stability are major considerations affecting the development of high-temperature chemical sensors. In the case of a metal/SiC Schottky diode for a number of metals, the SiC becomes more chemically active in the presence of the thin metal film on the SiC surface at high temperature. This increase in chemical reactivity causes changes in chemical composition and structure of the metal/SiC interface. The practical effect of the changes is to alter the electronic and other properties of the device in such a manner as to degrade its performance as a chemical sensor. To delay or prevent these changes, it is necessary to limit operation to a temperature <450 C for these sensor structures. The present proposal to incorporate interfacial CeO2 films is based partly on the observation that nanostructured materials in general have potentially useful electrical properties, including an ability to enhance the transfer of electrons. In particular, nanostructured CeO2, that is CeO2 with nanosized grains, has shown promise for incorporation into hightemperature electronic devices. Nanostructured CeO2 films can be formed on SiC and have been shown to exhibit high thermal stability on SiC, characterized by the ability to withstand temperatures somewhat greater than 700 C for limited times. The exchanges of oxygen between CeO2 and SiC prevent the formation of carbon and other chemical species that are unfavorable for operation of a SiC-based Schottky diode as a chemical sensor. Consequently, it is anticipated that in a Pd

  9. Evidence for interstellar SiC in the Murray carbonaceous meteorite

    NASA Technical Reports Server (NTRS)

    Bernatowicz, Thomas; Wopenka, Brigitte; Fraundorf, Gail; Ming, Tang; Anders, Edward

    1987-01-01

    Silicon carbide has been identified in two separates from the Murray carbonaceous chondrite that are enriched 20,000-fold in isotopically anomalous neon and xenon. The SiC is present in the form of crystalline grains 0.1-1 micron in size. Cubic and 111-plane-twinned cubic are the most common ordered polytypes observed so far. The anomalous isotopic composition of its carbon, nitrogen, and silicon indicates a presolar origin, probably in the atmospheres of red giants. An additional silicon- and oxygen-rich phase shows large isotropic anomalies in nitrogen and silicon, also associated with a presolar origin.

  10. Design and fabrication of large-scale lightweight SiC space mirror

    NASA Astrophysics Data System (ADS)

    Zhang, Jianhan; Zhang, Yumin; Han, Jiecai; He, Xiaodong; Yao, Wang

    2006-02-01

    Silicon carbide is a new type of optics material developed in recent years because it offered some advantages over other traditional optical substrate materials such as low density, low thermal expansion coefficient, high thermal conductivity, big special heat, big modulus of elasticity and potential cost and schedule. So in this paper, the silicon carbide space mirror was fabricated by both reaction bonded (RB) and chemical vapor deposition (CVD) process. The green body of the space mirror was prepared by silicon carbide powder, carbon powder, dilution and solidified agent using slip casting method. The space mirror blank was prepared by green body and pure silicon powder. They were laid in vacuum sintering furnace and sintered at 1500°C. In this temperature, silicon was melting then infiltrated in SiC green body and reacted with carbon to generate the new SiC, at the same time, bonded original SiC powder, in the end, the nonporous SiC/Si space mirror blank was fabricated. The reaction bonded silicon carbide (RBSiC) was consistent with original SiC powder, new generated SiC and unreacted Si. Because RBSiC was SiC/Si two-phase structure, the hardness difference between SiC and Si made the space mirror difficult to achieve precision optical surface by grinding. So a full density SiC thin film was coated on the surface of space mirror blank with RBSiC by chemical vapor deposition (CVD) process. The raw material was CH3SiCl3. The hydrogen (H2) was catalyst. The deposition temperature was 1300°C. The cooling rate could be controlled. The SiC space mirror was honeycomb open back lightweight structure. The honeycomb cellar could be triangle, rectangle, hexogen and sector. The biggest diameter of SiC space mirror blank which has been fabricated is approach one meter by forgoing process. In order to the forgoing process was feasible, a flat round SiC space mirror with 250mm diameter. The space mirror was composed of a 4mm thick round plane faceplate and hexagonal cellar

  11. SiC Micropipe Sprecta

    NASA Astrophysics Data System (ADS)

    Leff, David; Frasca, Albert

    1997-05-01

    This report focuses on the spectral response of 4H SiC PN junction micropipes when reverse and forward biased. Reverse biased 4H SiC PN junctions give a very strong UV line, 385nm (3.22eV), and blue line, 475nm (2.61eV). In the forward bias direction the spectra do not contain the UV, only the blue line, 490nm (2.53eV), with considerably better resolution. For isolating and measuring the micropipe spectra and structure, a sample fixture was fabricated from a power transistor case. In order to activate the micropipes in the SEM, a vacuum feed-thru was made from another power transistor case. The emitter and base leads were used as the vacuum feed-thru and were used to mount a very fine spring for making contact to the 1mm X 1mm PN junction on the SiC chip. In our attempts to study these pipes and their properties, we utilized the SE, BSE, and X-ray detectors on the SEM, a stereo microscope, and a grading monochrometer. From the utilization of this equipment, we found the locations of the micropipes, the forward and reverse bias spectrum, and the possible structural faults in the SiC. Thanks to Dr. Philip Neudeck at LeRC, and Dr. Kenneth Bladh of Wittenberg.

  12. Microstructure of TRISO Coated Particles from the AGR-1 Experiment I: SiC Grain Size and Grain Boundary Character

    SciTech Connect

    Rita Kirchhofer; John D, Hunn; Paul A. Demkowicz; James I. Cole; Brian P. Gorman

    2013-01-01

    Pre-irradiation SiC microstructures in TRISO coated fuel particles from the AGR-1 experiment were quantitatively characterized using electron backscatter diffraction (EBSD) and transmission electron microscopy (TEM). From EBSD it was determined that only the cubic polymorph of as-deposited SiC was present and the SiC had a high fraction of CSL S3 grain boundaries. Additionally, the local area misorientation (LAM), which is a qualitative measurement of strain in the SiC lattice, was mapped for each fuel variant. The morphology of the SiC / IPyC interfaces were characterized by TEM following site-specific focused ion beam (FIB) specimen preparation. It was determined that the SiC layer had a heavily faulted microstructure typical of CVD deposited SiC and that the average grain diameter increased from the SiC/IPyC interface for all the fuel variants, except V3 that showed a constant grain size across the layer.

  13. System for the growth of bulk SiC crystals by modified CVD techniques

    NASA Technical Reports Server (NTRS)

    Steckl, Andrew J.

    1994-01-01

    The goal of this program was the development of a SiC CVD growth of films thick enough to be useful as pseudo-substrates. The cold-walled CVD system was designed, assembled, and tested. Extrapolating from preliminary evaluation of SiC films grown in the system at relatively low temperatures indicates that the growth rate at the final temperatures will be high enough to make our approach practical. Modifications of the system to allow high temperature growth and cleaner growth conditions are in progress. This program was jointly funded by Wright Laboratory, Materials Directorate and NASA LeRC and monitored by NASA.

  14. Molten salt corrosion of SiC: Pitting mechanism

    NASA Technical Reports Server (NTRS)

    Jacobson, N. S.; Smialek, J. L.

    1985-01-01

    Thin films of Na2SO4 and Na2CO3 at 1000 C lead to severe pitting of sintered alpha-SiC. These pits are important as they cause a strength reduction in this material. The growth of product layers is related to pit formation for the Na2CO3 case. The early reaction stages involve repeated oxidation and dissolution to form sodium silicate. This results in severe grain boundary attack. After this a porous silica layer forms between the sodium silicate melt and the SiC. The pores in this layer appear to act as paths for the melt to reach the SiC and create larger pits.

  15. Epitaxial Growth of beta-Silicon Carbide (SiC) on a Compliant Substrate via Chemical Vapor Deposition (CVD)

    NASA Technical Reports Server (NTRS)

    Mitchell, Sharanda L.

    1996-01-01

    Many lattice defects have been attributed to the lattice mismatch and the difference in the thermal coefficient of expansion between SiC and silicon (Si). Stacking faults, twins and antiphase boundaries are some of the lattice defects found in these SiC films. These defects may be a partial cause of the disappointing performance reported for the prototype devices fabricated from beta-SiC films. The objective of this research is to relieve some of the thermal stress due to lattice mismatch when SiC is epitaxially grown on Si. The compliant substrate is a silicon membrane 2-4 microns thick. The CVD process includes the buffer layer which is grown at 1360 C followed by a very thin epitaxial growth of SiC. Then the temperature is raised to 1500 C for the subsequent growth of SiC. Since silicon melts at 1415 C, the SiC will be grown on molten Silicon which is absorbed by a porous graphite susceptor eliminating the SiC/Si interface. We suspect that this buffer layer will yield less stressed material to help in the epitaxial growth of SiC.

  16. Mechanisms of edge-dislocation formation in strained films of zinc blende and diamond cubic semiconductors epitaxially grown on (001)-oriented substrates

    SciTech Connect

    Bolkhovityanov, Yu. B.; Deryabin, A. S.; Gutakovskii, A. K.; Sokolov, L. V.

    2011-06-15

    Ninety degree edge misfit dislocations (MDs) are 'sessile' dislocations; such dislocations, however, were found in large amounts in relaxed films. The commonly accepted formation mechanism of such dislocations is an interaction of two complementary 60 deg. dislocations with appropriate Burger's vectors, for example: a/2[101] + a/2 [011] = a/2 [110]. In the present study, four possible types of interaction were analyzed: (i) random meeting of two complementary MDs; (ii) crossing of two complementary 60 deg. MDs in the vicinity of film-substrate interface in systems grown on substrates misoriented from exact (001) orientation; (iii) formation of edge MDs during cross-slipping of a secondary MD; and (iv) induced nucleation of a secondary complementary 60 deg. MD. Examples of discussed interactions are given. Contrary to the widespread opinion that edge MDs in GeSi and InGaAs films grown by MBE on Si and GaAs substrates predominantly form under elastic strains greater than 2% and at the final stage of plastic relaxation, in the present study, we show that such dislocations may also form at an early stage of plastic relaxation in films with less-than-1% lattice misfit with substrate. A necessary condition for that is a sufficient amount of 60 deg. dislocations available in the system by the moment the strained film starts growing. Dislocations (60 deg. ) can be introduced into the system using a preliminarily grown, partially or fully relaxed buffer layer. This layer serves as a source of threading dislocations for the next growing layer that favor the formation of paired complementary MDs and their 'reagents', edge MDs, at the interface with growing film.

  17. Aluminum acceptor four particle bound exciton complex in 4H, 6H, and 3C SiC

    NASA Technical Reports Server (NTRS)

    Clemen, L. L.; Devaty, R. P.; Macmillan, M. F.; Yoganathan, M.; Choyke, W. J.; Larkin, D. J.; Powell, J. A.; Edmond, J. A.; Kong, H. S.

    1993-01-01

    Evidence is presented for a four particle acceptor complex in 3C, 6H, and 4H SiC, obtained in low-temperature photoluminescence and cathodoluminescence experiments. The new lines were observed in p-type films lightly doped with aluminum, of 6H, 4H, and 3C SiC grown on the silicon (0001) face of 6H SiC under special conditions. The lines increase in intensity as more aluminum is added during growth. The multiplicity of observed lines is consistent with symmetry-based models similar to those which have been proposed to describe 4A centers in p-type zincblende semiconductors.

  18. Piecewise Cubic Interpolation Package

    Energy Science and Technology Software Center (ESTSC)

    1982-04-23

    PCHIP (Piecewise Cubic Interpolation Package) is a set of subroutines for piecewise cubic Hermite interpolation of data. It features software to produce a monotone and "visually pleasing" interpolant to monotone data. Such an interpolant may be more reasonable than a cubic spline if the data contain both 'steep' and 'flat' sections. Interpolation of cumulative probability distribution functions is another application. In PCHIP, all piecewise cubic functions are represented in cubic Hermite form; that is, f(x)more » is determined by its values f(i) and derivatives d(i) at the breakpoints x(i), i=1(1)N. PCHIP contains three routines - PCHIM, PCHIC, and PCHSP to determine derivative values, six routines - CHFEV, PCHFE, CHFDV, PCHFD, PCHID, and PCHIA to evaluate, differentiate, or integrate the resulting cubic Hermite function, and one routine to check for monotonicity. A FORTRAN 77 version and SLATEC version of PCHIP are included.« less

  19. Moment mapping of body-centered-cubic Fe{sub x}Mn{sub 1−x} alloy films on MgO(001)

    SciTech Connect

    Idzerda, Y. U. Bhatkar, H.; Arenholz, E.

    2015-05-07

    The alloy composition and elemental magnetic moments of bcc single crystal films of compositionally graded Fe{sub x}Mn{sub 1−x} films (20 nm thick films with 0.8 ≤ x ≤ 0.9) grown on MgO(001) are spatially mapped using X-ray absorption spectroscopy and magnetic circular dichroism. Electron diffraction measurements on single composition samples confirmed that the structure of Fe{sub x}Mn{sub 1−x} films remained epitaxial and in the bcc phase from 0.65 ≤ x ≤ 1, but rotated 45° with respect to the MgO(001) surface net. This is beyond the bulk bcc stability limit of x = 0.88. The Fe moment is found to gradually reduce with increasing Mn content with a very abrupt decline at x = 0.85, a slightly higher composition than observed in the bulk. Surprisingly, the Mn exhibits a very small net moment (<0.1 μ{sub B}) at all compositions, suggesting a complex Mn spin structure.

  20. SiC detector damage and characterization for high intensity laser-plasma diagnostics

    NASA Astrophysics Data System (ADS)

    Torrisi, L.; Cannavò, A.

    2016-05-01

    Silicon-Carbide (SiC) detectors are always more extensively employed as diagnostics in laser-generated plasma due to their remarkable properties such as their high band gap, high carrier velocity, high detection efficiency, high radiation resistance and low leakage current at room temperature. SiC detectors, in comparison with Si detectors, have the advantage of being insensitive to visible light, having low reverse current at high temperature and high radiation hardness. A similar energy resolution characterizes the two types of detectors, being 0.8% in Si and 1.0% in SiC, as measured detecting 5.8 MeV alpha particles. Generally, SiC detectors are employed as laser-plasma diagnostics in time-of-flight configuration, permitting the simultaneous detection of photons, electrons and ions based on discrimination of velocity. SiC detectors can be employed in the proportionality regime, because their response is proportional to the radiation energy deposited in the active layer. Using thin absorbers in front of the detectors makes it possible to have further information on the radiation nature, intensity and energy. Surface characterization of SiC before and after prolonged exposure to hot plasma laser generated shows the formation of bulk defects and thin film deposition on the detector surface limiting the device functionality.

  1. Update on SIC-Based Inverter Technology

    SciTech Connect

    Chinthavali, Madhu Sudhan; Zhang, Hui; Tolbert, Leon M; Ozpineci, Burak

    2009-01-01

    This paper presents a study of silicon carbide (SiC) technology which includes device characterization and modeling, inverter simulation, and test results for several prototype inverters. The static and dynamic characteristics of discrete devices and half bridge modules are presented. Test results of a 55 kW hybrid inverter with SiC Schottky diodes and an 18 kW all-SiC inverter using SiC JFETs and Schottky diodes are demonstrated.

  2. In situ toughened SiC ceramics with Al-B-C additions and oxide-coated SiC platelet/SiC composites

    SciTech Connect

    Cao, J. |

    1996-12-01

    This work aimed at fabrication and characterization of high toughness SiC ceramics through the applications of in situ toughening and SiC platelet reinforcement. The processing-microstructure-property relations of hot pressed SiC with Al, B, and C additions (designated as ABC-SiC) were investigated. Through a liquid phase sintering mechanism, dense SiC was obtained by hot pressing at a temperature as low as 1,700 C with 3 wt% Al, 0.6 wt% B, and 2 wt% C additions. These sintering aids also enhanced the {beta}-to-{alpha} (3C-to-4H) phase transformation, which promoted SiC grains to grow into plate-like shapes. Under optimal processing conditions, the microstructure exhibited high-aspect-ratio plate-shaped grains with a thin (< 1 nm) Al-containing amorphous grain boundary film. The mechanical properties of the toughened SiC and the composites were evaluated in comparison with a commercial Hexoloy SiC under identical test conditions. The C-curve behavior was examined using the strength-indentation load relationship and compared with that directly measured using precracked compact tension specimens. The in situ toughened ABC-SiC exhibited much improved flaw tolerance and a significantly rising R-curve behavior. A steady-state toughness in excess of 9 MPam{sup 1/2} was recorded for the ABC-SiC in comparison to a single valued toughness below 3 MPam{sup 1/2} for the Hexoloy. Toughening in the ABC-SiC was mainly attributed to grain bridging and subsequent pullout of the plate-shaped grains. The high toughness ABC-SiC exhibited a bend strength of 650 MPa with a Weibull modulus of 19; in comparison, the commercial SiC showed a bend strength of 400 MPa with a Weibull modulus of 6. Higher fracture toughness was also achieved by the reinforcement of SiC platelets, encapsulated with alumina, yttria, or silica, in a SiC matrix.

  3. Interaction Of Water Molecules With SiC(001) Surfaces

    SciTech Connect

    Cicero, G; Catellani, A; Galli, G

    2004-08-10

    We have investigated the interaction of water molecules with the polar Si- and C- terminated surfaces of cubic Silicon Carbide by means of ab initio molecular dynamics simulations at finite temperature. Different water coverages were considered, from {1/4} to a complete monolayer. Irrespective of coverage, we find that water dissociates on the silicon terminated surfaces, leading to important changes in both its structural and electronic properties. On the contrary, the carbon terminated surface remains inert when exposed to water. We propose experiments to reveal the ionic and electronic structure of wet Si-terminated surfaces predicted by our calculations, which at full coverage are notably different from those of hydrated Si(001) substrates. Finally, we discuss the implications of our results for SiC surface functionalization.

  4. A new approach for fabrications of SiC based photodetectors

    PubMed Central

    Aldalbahi, Ali; Li, Eric; Rivera, Manuel; Velazquez, Rafael; Altalhi, Tariq; Peng, Xiaoyan; Feng, Peter X.

    2016-01-01

    We report on a new approach to quickly synthesize high-quality single crystalline wide band gap silicon carbide (SiC) films for development of high-performance deep ultraviolet (UV) photodetectors. The fabricated SiC based UV photodetectors exhibited high response while maintaining cost-effectiveness and size miniaturization. Focus of the experiments was on studies of electrical and electronic properties, as well as responsivity, response and recovery times, and repeatability of the deep UV photodetectors. Raman scattering spectroscopy and scanning electron microscope (SEM) were used to characterize the SiC materials. Analyses of the SEM data indicated that highly flat SiC thin films have been obtained. Based on the synthesized SiC, deep UV detectors are designed, fabricated, and tested with various UV wavelength lights at different radiation intensities. Temperature effect and bias effect on the photocurrent strength and signal-to-noise ratio, humidity effect on the response time and recovery time of the fabricated detectors have been carefully characterized and discussed. The detectors appear to have a very stable baseline and repeatability. The obtained responsivity is more than 40% higher compared to commercial detectors. The good performance of the photodetectors at operating temperature up to 300 °C remains nearly unchanged. PMID:26988399

  5. CVD of SiC and AlN using cyclic organometallic precursors

    NASA Technical Reports Server (NTRS)

    Interrante, L. V.; Larkin, D. J.; Amato, C.

    1992-01-01

    The use of cyclic organometallic molecules as single-source MOCVD precursors is illustrated by means of examples taken from our recent work on AlN and SiC deposition, with particular focus on SiC. Molecules containing (AlN)3 and (SiC)2 rings as the 'core structure' were employed as the source materials for these studies. The organoaluminum amide, (Me2AlNH2)3, was used as the AlN source and has been studied in a molecular beam sampling apparatus in order to determine the gas phase species present in a hot-wall CVD reactor environment. In the case of SiC CVD, a series of disilacyclobutanes (Si(XX')CH2)2 (with X and X' = H, CH3, and CH2SiH2CH3), were examined in a cold-wall, hot-stage CVD reactor in order to compare their relative reactivities and prospective utility as single-source CVD precursors. The parent compound, disilacyclobutane, (SiH2CH2)2, was found to exhibit the lowest deposition temperature (ca. 670 C) and to yield the highest purity SiC films. This precursor gave a highly textured, polycrystalline film on the Si(100) substrates.

  6. A new approach for fabrications of SiC based photodetectors

    NASA Astrophysics Data System (ADS)

    Aldalbahi, Ali; Li, Eric; Rivera, Manuel; Velazquez, Rafael; Altalhi, Tariq; Peng, Xiaoyan; Feng, Peter X.

    2016-03-01

    We report on a new approach to quickly synthesize high-quality single crystalline wide band gap silicon carbide (SiC) films for development of high-performance deep ultraviolet (UV) photodetectors. The fabricated SiC based UV photodetectors exhibited high response while maintaining cost-effectiveness and size miniaturization. Focus of the experiments was on studies of electrical and electronic properties, as well as responsivity, response and recovery times, and repeatability of the deep UV photodetectors. Raman scattering spectroscopy and scanning electron microscope (SEM) were used to characterize the SiC materials. Analyses of the SEM data indicated that highly flat SiC thin films have been obtained. Based on the synthesized SiC, deep UV detectors are designed, fabricated, and tested with various UV wavelength lights at different radiation intensities. Temperature effect and bias effect on the photocurrent strength and signal-to-noise ratio, humidity effect on the response time and recovery time of the fabricated detectors have been carefully characterized and discussed. The detectors appear to have a very stable baseline and repeatability. The obtained responsivity is more than 40% higher compared to commercial detectors. The good performance of the photodetectors at operating temperature up to 300 °C remains nearly unchanged.

  7. A new approach for fabrications of SiC based photodetectors.

    PubMed

    Aldalbahi, Ali; Li, Eric; Rivera, Manuel; Velazquez, Rafael; Altalhi, Tariq; Peng, Xiaoyan; Feng, Peter X

    2016-01-01

    We report on a new approach to quickly synthesize high-quality single crystalline wide band gap silicon carbide (SiC) films for development of high-performance deep ultraviolet (UV) photodetectors. The fabricated SiC based UV photodetectors exhibited high response while maintaining cost-effectiveness and size miniaturization. Focus of the experiments was on studies of electrical and electronic properties, as well as responsivity, response and recovery times, and repeatability of the deep UV photodetectors. Raman scattering spectroscopy and scanning electron microscope (SEM) were used to characterize the SiC materials. Analyses of the SEM data indicated that highly flat SiC thin films have been obtained. Based on the synthesized SiC, deep UV detectors are designed, fabricated, and tested with various UV wavelength lights at different radiation intensities. Temperature effect and bias effect on the photocurrent strength and signal-to-noise ratio, humidity effect on the response time and recovery time of the fabricated detectors have been carefully characterized and discussed. The detectors appear to have a very stable baseline and repeatability. The obtained responsivity is more than 40% higher compared to commercial detectors. The good performance of the photodetectors at operating temperature up to 300 °C remains nearly unchanged. PMID:26988399

  8. Atmospheric pressure growth of graphene on SiC(0001)

    NASA Astrophysics Data System (ADS)

    Seyller, Thomas

    2009-03-01

    Graphene, a single monolayer of sp^2-bonded carbon, is a very unique 2-dimensional electron gas system with electronic properties fundamentally different to other 2DEG systems [1]. Several production routes exist for graphene. Among them, the solid-state decomposition of hexagonal silicon carbide (SiC) surfaces [2] is particularly attractive for the development of graphene based electronics [3,4]. The first part of the presentation gives a brief summary of recent studies on the structural and electronic properties of graphene and few-layer graphene grown on SiC(0001) under ultra-high vacuum (UHV) conditions. The second part of the talk is devoted to recent progress in the growth of large domain graphene films on SiC(0001) in Ar atmosphere. It is shown that growth in Ar ambient leads to a significant improvement of the surface morphology and domain size as well as carrier mobility. [4pt] [1] A.H. Castro Neto, et al., Reviews of Modern Physics, in print (arXiv:0709.1163v2); and references therein. [0pt] [2] A. Charrier, et al., J. Appl. Phys. 92 (2002) 2479. [0pt] [3] C. Berger et al., J. Phys. Chem. B 108 (2004) 19912; C. Berger, et al., Science 312 (2006) 1191. [0pt] [4] A.K. Geim and K.S. Novoselov, Nature Mat. 6 (2007) 183.

  9. Growth and oxidization stability of cubic Zr{sub 1−x}Gd{sub x}N solid solution thin films

    SciTech Connect

    Höglund, C.; Alling, B.; Jensen, J.; Hultman, L.; Birch, J.; Hall-Wilton, R.

    2015-05-21

    We report Zr{sub 1−x}Gd{sub x}N thin films deposited by magnetron sputter deposition. We show a solid solubility of the highly neutron absorbing GdN into ZrN along the whole compositional range, which is in excellent agreement with our recent predictions by first-principles calculations. An oxidization study in air shows that Zr{sub 1−x}Gd{sub x}N with x reaching from 1 to close to 0 fully oxidizes, but that the oxidization is slowed down by an increased amount of ZrN or stopped by applying a capping layer of ZrN. The crystalline quality of Zr{sub 0.5}Gd{sub 0.5}N films increases with substrate temperatures increasing from 100 °C to 900 °C.

  10. Reactive sintering of SiC

    NASA Technical Reports Server (NTRS)

    Kim, Y. W.; Lee, J. G.

    1984-01-01

    Investigation of the sintering processes involved in the sintering of SiC revealed a connection between the types and quantities of sintering additives or catalysts and densification, initial shrinkage, and weight loss of the sintered SiC material. By sintering processes, is meant the methods of mass transport, namely solid vapor transport and grain boundary diffusion.

  11. Broadband Antireflection and Light Extraction Enhancement in Fluorescent SiC with Nanodome Structures

    PubMed Central

    Ou, Yiyu; Zhu, Xiaolong; Jokubavicius, Valdas; Yakimova, Rositza; Mortensen, N. Asger; Syväjärvi, Mikael; Xiao, Sanshui; Ou, Haiyan

    2014-01-01

    We demonstrate a time-efficient and low-cost approach to fabricate Si3N4 coated nanodome structures in fluorescent SiC. Nanosphere lithography is used as the nanopatterning method and SiC nanodome structures with Si3N4 coating are formed via dry etching and thin film deposition process. By using this method, a significant broadband surface antireflection and a considerable omnidirectional luminescence enhancement are obtained. The experimental observations are then supported by numerical simulations. It is believed that our fabrication method will be well suitable for large-scale production in the future. PMID:24722521

  12. Large-area SiC membrane produced by plasma enhanced chemical vapor deposition at relatively high temperature

    SciTech Connect

    Liu, Yu; Xie, Changqing

    2015-09-15

    Advances in the growth of silicon carbide (SiC) thin films with outstanding thermal and mechanical properties have received considerable attention. However, the fabrication of large-area free-standing SiC membrane still remains a challenge. Here, the authors report a plasma enhanced chemical vapor deposition process at a relatively high temperature to improve the free-standing SiC membrane area. A systematic study on the microstructural, mechanical, and optical properties of hydrogenated polycrystalline silicon carbide (poly-SiC{sub x}:H) thin films deposited at 600 °C with different annealing temperatures has been performed. In the as-deposited state, SiC{sub x}:H thin films show a polycrystalline structure. The crystallinity degree can be further improved with the increase of the postdeposition annealing temperature. The resulting process produced free-standing 2-μm-thick SiC membranes up to 70 mm in diameter with root mean square roughness of 3.384 nm and optical transparency of about 70% at 632.8 nm wavelength. The large-area SiC membranes made out of poly-SiC{sub x}:H thin films deposited at a relatively high temperature can be beneficial for a wide variety of applications, such as x-ray diffractive optical elements, optical and mechanical filtering, lithography mask, lightweight space telescopes, etc.

  13. Low temperature deposition and characterization of n- and p-type silicon carbide thin films and associated ohmic and Schottky contacts. Annual report, 1 January-31 December 1992

    SciTech Connect

    Davis, R.F.; Nemanich, R.J.; Kern, R.S.; Patterson, R.; Rowland, L.B.

    1992-01-01

    Single-crystal epitaxial films of cubic Beta(3C)-SiC(111) and AlN(0001) have been deposited on alpha(6H)-SiC(OOO1) substrates oriented 3-4 deg towards 1120 at 1050 deg C via gas-source molecular beam epitaxy using disilane (Si2H6), ethylene (C2H4), thermal evaporation of Al and activated N species derived from an ECR plasma. High resolution transmission electron microscopy revealed that the nucleation and growth of the Beta(3C)-SiC regions occurred primarily on terraces between closely spaced steps. Pseudomorphic bilayer structures containing Beta(3C)-SiC and 2H-AlN have been grown under the same conditions for the first time. HREED and cross-sectional HRTEM showed all layers to be monocrystalline. Initial high temperature chemical interdiffusion studies between SiC and AIN show that all components diffuse very slowly across the interface. AHRTEM and SAS are being used to determine the concentration profiles. Thin film solid solutions of AIN and SiC have been deposited using similar techniques and conditions as the individual compounds. Metal contacts of Ti, Pt and Hf deposited at RT on n-type alpha(6H)-SiC(OOO1) exhibit rectifying behavior with ideality factors between 1.01 and 1.09. The Pt and Hf contacts had leakage currents of 5xl0-8 A/cm2 at -10V. Values of barrier heights for all contacts were within a few tenths of 1.0eV which is indicative that the Fermi level is pinned at the SiC surface.... Films, SiC, AlN, Gas source molecular beam epitaxy, Transmission electron microscopy, Chemical interdiffusion, Metal contacts, Ti, Pt, Hf, Ideality factors, Fermi level pinning.

  14. Thermal expansion and elastic anisotropy in single crystal Al2O3 and SiC reinforcements

    NASA Technical Reports Server (NTRS)

    Salem, Jonathan A.; Li, Zhuang; Bradt, Richard C.

    1994-01-01

    In single crystal form, SiC and Al2O3 are attractive reinforcing components for high temperature composites. In this study, the axial coefficients of thermal expansion and single crystal elastic constants of SiC and Al2O3 were used to determine their coefficients of thermal expansion and Young's moduli as a function of crystallographic orientation and temperature. SiC and Al2O3 exhibit a strong variation of Young's modulus with orientation; however, their moduli and anisotropies are weak functions of temperature below 1000 C. The coefficients of thermal expansion exhibit significant temperature dependence, and that of the non-cubic Al2O3 is also a function of crystallographic orientation.

  15. Molecular Dynamics Modeling of the Thermal Conductivity of Irradiated SiC as a Function of Cascade Overlap

    SciTech Connect

    Crocombette, J.-P.; Dumazer, Guillaume; Hoang, Nguyen Q.; Gao, Fei; Weber, William J.

    2007-01-15

    SiC thermal conductivity is known to decrease under irradiation. To understand this effect, we study the variation of the thermal conductivity of cubic SiC with defect accumulation induced by displacement cascades. We use an empirical potential of the Tersoff type in the framework of non-equilibrium molecular dynamics. The conductivity of SiC is found to decrease with dose, in very good quantitative agreement with low temperature irradiation experiments. The results are analyzed in view of the amorphization states that are created by the cascade accumulation simulations. The calculated conductivity values at lower doses are close to the smallest measured values after high temperature irradiation, indicating that the decrease of the conductivity observed at lower doses is related to the creation of point defects. A subsequent decrease takes place upon further cascade accumulation. It is characteristic of the amorphization of the material and is experimentally observed for low temperature irradiation only.

  16. Electronic and Optical Properties of Nitrogen Doped SiC Nanocrystals: First Principles Study

    NASA Astrophysics Data System (ADS)

    Javan, Masoud Bezi

    2013-05-01

    A typical nitrogen doped spherical SiC nanocrystal with a diameter of 1.2 nm (Si43C44H76) using linear combination atomic orbital (LCAO) in combination with pseudopotential density functional calculation have been studied. Our selected SiC nanocrystal has been modeled taking all the cubic bulk SiC atoms contained within a sphere of a given radius and terminating the surface dangling bonds with hydrogen atoms. We have examined nine possible situations in which nitrogen has a high probability for replacement in the lattice or placed between atoms in the nanocrystal. We have found that the silicone can substitute with a nitrogen atom in each layer as the constructed nanocrystals remain thermodynamically stable. Also the nitrogen atom can be placed between the free atomic spaces as the more thermodynamically stable position of the nitrogen is between the topmost layers. Also the optical absorption and refractive index energy dispersions of the pure and various stable doped SiC nanocrystals were studied.

  17. Modified electrodes based on lipidic cubic phases.

    PubMed

    Bilewicz, Renata; Rowiński, Paweł; Rogalska, Ewa

    2005-04-01

    The lipidic cubic phase can be characterized as a curved bilayer forming a three-dimensional, crystallographical, well-ordered structure that is interwoven by aqueous channels. It provides a stable, well-organized environment in which diffusion of both water-soluble and lipid-soluble compounds can take place. Cubic phases based on monoacylglycerols form readily and attract our interest due to their ability to incorporate and stabilize proteins. Their lyotropic and thermotropic phase behaviour has been thoroughly investigated. At hydration over 20%, lipidic cubic phases Ia3d and Pn3m are formed. The latter is stable in the presence of excess water, which is important when the cubic phase is considered as an electrode-modifying material. Due to high viscosity, the cubic phases can be simply smeared over solid substrates such as electrodes and used to host enzymes and synthetic catalysts, leading to new types of catalytically active modified electrodes as shown for the determination of cholesterol, CO(2), or oxygen. The efficiency of transport of small hydrophilic molecules within the film can be determined by voltametry using two types of electrodes: a normal-size electrode working in the linear diffusion regime, and an ultramicroelectrode working under spherical diffusion conditions. This allows determining both the concentration and diffusion coefficient of the electrochemically active probe in the cubic phase. The monoolein-based cubic phase matrices are useful for immobilizing enzymes on the electrode surface (e.g., laccases from Trametes sp. and Rhus vernicifera were employed for monitoring dioxygen). The electronic contact between the electrode and the enzyme was maintained using suitable electroactive probes. PMID:15833697

  18. Ultrafast Optical Measurements of Thermal Conductivity and Sound Velocity of Amorphous SiC

    NASA Astrophysics Data System (ADS)

    Hondongwa, Donald; Olasov, Lauren; Daly, Brian; King, Sean; Bielefeld, Jeff

    2011-03-01

    We present ultrafast optical measurements of longitudinal sound velocity and thermal transport in hydrogenated amorphous carbon (a-SiC:H) films. The films were grown on Si wafers by PECVD using combinations of methylsilanes and H2 and He diluent gases. The films were well characterized and found to have densities (1.0 -- 2.5 g cm-3) and dielectric constants (2.8 -- 7.2) that spanned a wide range of values. Prior to their measurement, the a-SiC:H films were coated with 40-70 nm of polycrystalline Al. The pump-probe measurements were performed at room temperature using a modelocked Ti:sapphire laser. Transient reflectivity changes that are associated with very high frequency sound waves (picosecond ultrasonics) and the cooling rate of the SiC sample (Time Domain Thermorerflectance (TDTR)) were measured. We extract values for the thermal conductivity and sound velocity of the SiC films, and analyze the results in terms of rigidity percolation effects within the SiC layers. This work was supported by NSF award DMR-0906753.

  19. Deposition Of Cubic BN On Diamond Interlayers

    NASA Technical Reports Server (NTRS)

    Ong, Tiong P.; Shing, Yuh-Han

    1994-01-01

    Thin films of polycrystalline, pure, cubic boron nitride (c-BN) formed on various substrates, according to proposal, by chemical vapor deposition onto interlayers of polycrystalline diamond. Substrate materials include metals, semiconductors, and insulators. Typical substrates include metal-cutting tools: polycrystalline c-BN coats advantageous for cutting ferrous materials and for use in highly oxidizing environments-applications in which diamond coats tend to dissolve in iron or be oxidized, respectively.

  20. Accurate monotone cubic interpolation

    NASA Technical Reports Server (NTRS)

    Huynh, Hung T.

    1991-01-01

    Monotone piecewise cubic interpolants are simple and effective. They are generally third-order accurate, except near strict local extrema where accuracy degenerates to second-order due to the monotonicity constraint. Algorithms for piecewise cubic interpolants, which preserve monotonicity as well as uniform third and fourth-order accuracy are presented. The gain of accuracy is obtained by relaxing the monotonicity constraint in a geometric framework in which the median function plays a crucial role.

  1. Process for the controlled growth of single-crystal films of silicon carbide polytypes on silicon carbide wafers

    NASA Technical Reports Server (NTRS)

    Larkin, David J. (Inventor); Powell, J. Anthony (Inventor)

    1992-01-01

    A method for the controlled growth of single-crystal semiconductor-device-quality films of SiC polytypes on vicinal (0001) SiC wafers with low tilt angles is presented. Both homoepitaxial and heteroepitaxial SiC films can be produced on the same wafer. In particular, 3C-SiC and 6H-SiC films can be produced within selected areas of the same 6H-SiC wafer.

  2. Process for the controlled growth of single-crystal films of silicon carbide polytypes on silicon carbide wafers

    NASA Technical Reports Server (NTRS)

    Powell, J. Anthony (Inventor)

    1991-01-01

    This invention is a method for the controlled growth of single-crystal semiconductor device quality films of SiC polytypes on vicinal (0001) SiC wafers with low tilt angles. Both homoepitaxial and heteroepitaxial SiC films can be produced on the same wafer. In particular, 3C-SiC and 6H-SiC films can be produced within selected areas of the same 6H-SiC wafer.

  3. Refractory Oxide Coatings on Sic Ceramics

    NASA Technical Reports Server (NTRS)

    Lee, Kang N.; Jacobson, Nathan S.; Miller, Robert A.

    1994-01-01

    Silicon carbide with a refractory oxide coating is potentially a very attractive ceramic system. It offers the desirable mechanical and physical properties of SiC and the environmental durability of a refractory oxide. The development of a thermal shock resistant plasma-sprayed mullite coating on SiC is discussed. The durability of the mullite/SiC in oxidizing, reducing, and molten salt environments is discussed. In general, this system exhibits better behavior than uncoated SiC. Areas for further developments are discussed.

  4. Absorption and emission of silicon nanocrystals embedded in SiC: Eliminating Fabry-Pérot interference

    SciTech Connect

    Schnabel, M.; Summonte, C.; Canino, M.; Dyakov, S. A.; López-Conesa, L.; Löper, P.; Janz, S.; Wilshaw, P. R.

    2015-01-28

    Silicon nanocrystals embedded in SiC are studied by spectrophotometry and photoluminescence (PL) spectroscopy. Absorptivities are found to be affected by residual Fabry-Pérot interference arising from measurements of reflection and transmission at locations of different film thickness. Multiple computational and experimental methods to avoid these errors in thin film measurements, in general, are discussed. Corrected absorptivity depends on the quantity of Si embedded in the SiC but is independent of the Si crystallinity, indicating a relaxation of the k-conservation criterion for optical transitions in the nanocrystals. Tauc gaps of 1.8–2.0 and 2.12 eV are determined for Si nanoclusters and SiC, respectively. PL spectra exhibit a red-shift of ∼100 nm per nm nominal Si nanocluster diameter, which is in agreement with quantum confinement but revealed to be an artifact entirely due to Fabry-Pérot interference. Several simple experimental methods to diagnose or avoid interference in PL measurements are developed that are applicable to all thin films. Corrected PL is rather weak and invariant with passivation, indicating that non-paramagnetic defects are responsible for rapid non-radiative recombination. They are also responsible for the broad, sub-gap PL of the SiC, and can wholly account for the form of the PL of samples with Si nanoclusters. The PL intensity of samples with Si nanoclusters, however, can only be explained with an increased density of luminescent defects in the SiC due to Si nanoclusters, efficient tunneling of photogenerated carriers from Si nanoclusters to SiC defects, or with emission from a-Si nanoclusters. Films prepared on Si exhibit much weaker PL than the same films prepared on quartz substrates.

  5. Comparison of SiC mirror approaches

    NASA Astrophysics Data System (ADS)

    Carrigan, Keith; Riso, Michael; Khatri, Shayna; Douglas, Christopher

    2013-09-01

    Silicon Carbide (SiC) mirrors hold many advantages over traditional optical materials and are increasingly common in optical systems. The wide range of optical applications necessitates different approaches to the manufacturing and finishing of SiC mirrors. Three key advancements have led to this differentiation: 1) manufacturing of CVD clad SiC mirrors in near cost and schedule parity with Zerodur, 2) super-polish of amorphous Silicon claddings, 3) low-roughness polishing results of bare reaction-bonded SiC aspheres. Three approaches which utilize these advancements will be discussed, each with its own strengths and weaknesses for specific applications. The relative schedules and performance of these approaches will also be compared, with Zerodur used as a reference.

  6. SiC nanowires: A photocatalytic nanomaterial

    SciTech Connect

    Zhou Weimin; Yan Lijun; Wang Ying; Zhang Yafei

    2006-07-03

    Single-crystal {beta}-SiC nanowires coated with amorphous SiO{sub 2} were synthesized by a simple thermal evaporation technique. The photocatalytic activity of the SiC nanowires was characterized by measuring the photodegradation rate of acetaldehyde catalyzed by SiC as a function of UV irradiation time. It exhibited excellent photocatalytic activity, leading to the efficient decomposition of acetaldehyde by irradiation with UV light. The progress of the photocatalytic reaction can be monitored by the evolution of one of the products, CO{sub 2}. It has been observed that the as-synthesized SiC nanowires (with the SiO{sub 2} coating) have higher catalytic activity than the HF-etched, oxide-free SiC nanowires.

  7. Ab initio study of electron-phonon coupling in boron-doped SiC

    NASA Astrophysics Data System (ADS)

    Margine, E. R.; Blase, X.

    2008-11-01

    Density functional theory calculations have been used to study the electronic structure, lattice dynamics, and electron-phonon coupling in boron-doped silicon carbide in the cubic phase. Our results provide evidence that the recently discovered superconducting transition in boron-doped silicon carbide can be explained within a standard phonon-mediated mechanism. For the same doping rate, the coupling constant λ in B-doped SiC is very close to that of doped diamond and twice as large as that of B-doped silicon. However, doped silicon carbide differs from its diamond counterpart as most of the electron-phonon coupling originates from low energy vibrational modes.

  8. Chemically vapor deposited silicon carbide (SiC) for optical applications

    NASA Astrophysics Data System (ADS)

    Pickering, Michael A.; Taylor, Raymond L.; Keeley, Joseph T.; Graves, George A.

    1989-10-01

    Important physical, optical, thermal, and mechanical properties of cubic (beta) silicon carbide produced via a bulk chemical vapor deposition (CVD) process, developed at CVD Incorporated, are presented in this paper. The material's properties make it an ideal candidate material for optical components for lidar mirrors, solar collectors and concentrators, and astronomical telescopes. The CVD process has been scaled to produce large monolithic pieces of bulk SiC, i.e., disks up to 60-cm (24-in.) diameter and plates up to 76-cm (30-in.) long by 46-cm (18-in.) wide with thickness up to 13 mm (0.5 in.).

  9. Development of Sic Gas Sensor Systems

    NASA Technical Reports Server (NTRS)

    Hunter, G. W.; Neudeck, P. G.; Okojie, R. S.; Beheim, G. M.; Thomas, V.; Chen, L.; Lukco, D.; Liu, C. C.; Ward, B.; Makel, D.

    2002-01-01

    Silicon carbide (SiC) based gas sensors have significant potential to address the gas sensing needs of aerospace applications such as emission monitoring, fuel leak detection, and fire detection. However, in order to reach that potential, a range of technical challenges must be overcome. These challenges go beyond the development of the basic sensor itself and include the need for viable enabling technologies to make a complete gas sensor system: electrical contacts, packaging, and transfer of information from the sensor to the outside world. This paper reviews the status at NASA Glenn Research Center of SiC Schottky diode gas sensor development as well as that of enabling technologies supporting SiC gas sensor system implementation. A vision of a complete high temperature microfabricated SiC gas sensor system is proposed. In the long-term, it is believed that improvements in the SiC semiconductor material itself could have a dramatic effect on the performance of SiC gas sensor systems.

  10. Cubic-normal distribution

    NASA Astrophysics Data System (ADS)

    Peng, Gan Chew; Hin, Pooi Ah; Ho, C. K.

    2015-12-01

    The power-normal distribution given in Yeo and Johnson in year 2000 is a unimodal distribution with wide ranges of skewness and kurtosis. A shortcoming of the power-normal distribution is that the negative and positve parts of the underlying random variable have to be specified by two different expressions of the standard normal random variable. In this paper, we construct a new distribution, called the cubic-normal distribution, via a single polynomial expression in cubic root function. Apart from having the properties which are similar to those of the power-normal distribution, this cubic-normal distribution can be developed into a multivariate version which is more attractive from the theoretical and computational points of view.

  11. Growth and characterization of cubic and non-cubic Ge nanocrystals

    NASA Astrophysics Data System (ADS)

    Mukherjee, S.; Pradhan, A.; Mukherjee, S.; Maitra, T.; Nayak, A.; Bhunia, S.

    2016-05-01

    Germanium nanocrystals with tetragonal (ST-12) and diamond like cubic (Ge-I) phases have been selectively grown by controlling the ionization and electrostatic potential of Ge clusters in an ion cluster beam deposition system. Predominantly tetragonal nanocrystals were obtained when grown using neutral clusters. The percentage of cubic phase increased when grown by ionizing the clusters and accelerating them towards substrates by applying electrostatic bias in the range of 1.5 -2.5 kV. Raman spectroscopic measurement showed strong peak at 275 cm-1 and 300 cm-1 for tetragonal and cubic Ge nanocrystals, respectively. TEM measurements showed crystalline lattice fringes of both type of the nanocrystals. The selected area electron diffraction patterns showed (111) and (210) as the dominating lattice planes for tetragonal nanocrystals while the cubic phases had (111), (311) and (331) as the prominent lattice planes. The optical absorption edge redshifted from 1.75 to 1.55 eV as the percentage of the cubic phases increased in the NC composition in the composite film.

  12. Cryogenic Performance of Trex SiC Mirror

    NASA Technical Reports Server (NTRS)

    Foss, Colby; Kane, Dave; Bray, Donald; Hadaway, James

    2005-01-01

    Low cost, high performance lightweight Silicon Carbide (Sic) mirrors provide an alternative to Beryllium mirrors. A Trex Enterprises 0.25m diameter lightweight Sic mirror using its patented Chemical Vapor Composites (CVC) technology was evaluated for its optical performance. CVC Sic is chemically pure, thermally stable, and mechanically stiff. CVC technology yields higher growth rate than that of CVD Sic. NASA has funded lightweight optical materials technology development efforts involving Sic mirrors for future space based telescope programs. As part of these efforts, a Trex Sic was measured interferometrically from room temperature to 30 degrees Kelvin. This paper will discuss the test goals, the test instrumentation, test results, and lessons learned.

  13. Elastic and thermodynamical properties of cubic (3 C) silicon carbide under high pressure and high temperature

    NASA Astrophysics Data System (ADS)

    Varshney, Dinesh; Shriya, S.; Varshney, M.; Singh, N.; Khenata, R.

    2015-08-01

    Pressure-dependent first-order phase transition, mechanical, elastic, and thermodynamical properties of cubic zinc blende to rock-salt structures in 3 C silicon carbide (SiC) are presented. An effective interatomic interaction potential for SiC is formulated. The potential for SiC incorporates long-range Coulomb, charge transfer interactions, covalency effect, Hafemeister and Flygare type short-range overlap repulsion extended up to the second-neighbour ions, van der Waals interactions and zero point energy effects. The developed potential including many body non-central forces validates the Cauchy discrepancy successfully to explain the high-pressure structural transition, and associated volume collapse. The 3 C SiC ceramics lattice infers mechanical stiffening, thermal softening, and ductile (brittle) nature from the pressure (temperature) dependent elastic constants behaviour. To our knowledge, these are the first quantitative theoretical predictions of the pressure and temperature dependence of mechanical and thermodynamical properties explicitly the mechanical stiffening, thermally softening, and brittle/ductile nature of 3 C SiC and still awaits experimental confirmations.

  14. New biomorphic SiC ceramics coated with bioactive glass for biomedical applications.

    PubMed

    González, P; Serra, J; Liste, S; Chiussi, S; León, B; Pérez-Amor, M; Martínez-Fernández, J; de Arellano-López, A R; Varela-Feria, F M

    2003-11-01

    A new generation of light, tough and high-strength material for medical implants for bone substitutions with a good biological response is presented. The innovative product that fulfills all these requirements is based on biomorphic silicon carbide ceramics coated with a bioactive glass layer. The combination of the excellent mechanical properties and low density of the biomorphic SiC ceramics, used as a base material for implants, with the osteoconducting properties of the bioactive glass materials opens new possibilities for the development of alternative dental and orthopedic implants with enhanced mechanical and biochemical properties that ensures optimum fixation to living tissue. Biomorphic SiC is fabricated by molten-Si infiltration of carbon templates obtained by controlled pyrolysis of wood. Through this process, the microstructure of the final SiC product mimics that of the starting wood, which has been perfected by natural evolution. The basic features of such microstructure are its porosity (ranging from 30% to 70%) and its anisotropy, which resembles the cellular microstructure and the mechanical characteristics of the bone. The SiC ceramics have been successfully coated with a uniform and adherent bioactive glass film by pulsed laser ablation using an excimer ArF laser. The excellent coverage of the SiC rough surface without film spallation or detachment is demonstrated. In order to assess the coating bioactivity, in vitro tests by soaking the samples in simulated body fluid have been carried out. After 72 h, the formation of a dense apatite layer has been observed even in interconnecting pores by SEM and energy dispersive X-ray spectroscopy analysis demonstrating the bioactive response of this product. PMID:14530079

  15. Strong visible electroluminescence from silicon nanocrystals embedded in a silicon carbide film

    SciTech Connect

    Huh, Chul Kim, Tae-Youb; Ahn, Chang-Geun; Kim, Bong Kyu

    2015-05-25

    We report the strong visible light emission from silicon (Si) nanocrystals (NCs) embedded in a Si carbide (SiC) film. Compared to Si NC light-emitting diode (LED) by employing the Si nitride (SiN{sub x}) film as a surrounding matrix, the turn-on voltage of the Si NC LED with the SiC film was significantly decreased by 4 V. This was attributed to a smaller barrier height for injecting the electrons into the Si NCs due to a smaller band gap of SiC film than a SiN{sub x} film. The electroluminescence spectra increases with increasing forward voltage, indicating that the electrons are efficiently injected into the Si NCs in the SiC film. The light output power shows a linear increase with increasing forward voltage. The light emission originated from the Si NCs in a SiC film was quite uniform. The power efficiency of the Si NC LED with the SiC film was 1.56 times larger than that of the Si NC LED with the SiN{sub x} film. The Si NCs in a SiC film show unique advantages and are a promising candidate for application in optical devices.

  16. Packaging Technology Developed for High-Temperature SiC Sensors and Electronics

    NASA Technical Reports Server (NTRS)

    Chen, Liang-Yu; Hunter, Gary W.; Neudeck, Philip G.; Lei, Jih-Fen

    2000-01-01

    A ceramic- and thick-film-materials-based prototype electronic package designed for silicon carbide (SiC) high-temperature sensors and electronics has been successfully tested at 500 C in an oxygen-containing air environment for 500 hours. This package was designed, fabricated, assembled, and electronically evaluated at the NASA Glenn Research Center at Lewis Field with an in-house-fabricated SiC semiconductor test chip. High-temperature electronics and sensors are necessary for harsh-environment space and aeronautical applications, such as space missions to the inner solar system or the emission control electronics and sensors in aeronautical engines. Single-crystal SiC has such excellent physical and chemical material properties that SiC-based semiconductor electronics can operate at temperatures over 600 C, which is significantly higher than the limit for Si-based semiconductor devices. SiC semiconductor chips were recently demonstrated to be operable at temperatures as high as 600 C, but only in the probe station environment because suitable packaging technology for sensors and electronics at temperatures of 500 C and beyond did not exist. Thus, packaging technology for SiC-based sensors and electronics is immediately needed for both application and commercialization of high-temperature SiC sensors and electronics. In response to this need, researchers at Glenn designed, fabricated, and assembled a prototype electronic package for high-temperature electronics, sensors, and microelectromechanical systems (MEMS) using aluminum nitride (AlN) substrate and gold (Au) thick-film materials. This prototype package successfully survived a soak test at 500 C in air for 500 hours. Packaging components tested included thick-film high-temperature metallization, internal wire bonds, external lead bonds, and a SiC diode chip die-attachment. Each test loop, which was composed of thick-film printed wire, wire bond, and lead bond was subjected to a 50-mA direct current for 250

  17. Solute embrittlement of SiC

    NASA Astrophysics Data System (ADS)

    Enrique, Raúl A.; Van der Ven, Anton

    2014-09-01

    The energies and stresses associated with the decohesion of β-SiC in the presence of mobile Pd and Ag impurities are studied from first principles. Density functional theory calculations are parameterized with a generalized cohesive zone model and are analyzed within a thermodynamic framework that accounts for realistic boundary conditions in the presence of mobile impurities. We find that Pd impurities will embrittle SiC when Pd is in equilibrium with metallic Pd precipitates. Our thermodynamic analysis predicts that Pd embrittles SiC by substantially reducing the maximum stress of decohesion as a result of a phase transition between decohering planes involving an influx of Pd atoms. The methods presented in this work can be applied to study the thermodynamics of decohesion of SiC in other aggressive environments containing oxygen and water, for example, and yield environment dependent cohesive zone models for use in continuum approaches to study crack propagation and fracture.

  18. Solute embrittlement of SiC

    SciTech Connect

    Enrique, Raúl A.; Van der Ven, Anton

    2014-09-21

    The energies and stresses associated with the decohesion of β-SiC in the presence of mobile Pd and Ag impurities are studied from first principles. Density functional theory calculations are parameterized with a generalized cohesive zone model and are analyzed within a thermodynamic framework that accounts for realistic boundary conditions in the presence of mobile impurities. We find that Pd impurities will embrittle SiC when Pd is in equilibrium with metallic Pd precipitates. Our thermodynamic analysis predicts that Pd embrittles SiC by substantially reducing the maximum stress of decohesion as a result of a phase transition between decohering planes involving an influx of Pd atoms. The methods presented in this work can be applied to study the thermodynamics of decohesion of SiC in other aggressive environments containing oxygen and water, for example, and yield environment dependent cohesive zone models for use in continuum approaches to study crack propagation and fracture.

  19. SiC formation on Si(100) via C 60 precursors

    NASA Astrophysics Data System (ADS)

    De Seta, M.; Tomozeiu, N.; Sanvitto, D.; Evangelisti, F.

    2000-07-01

    The interaction between C 60 molecules and the Si(100) surface and the preparation of silicon-carbide thin films by thermal reaction of C 60 molecules with the Si(100) surface have been investigated using X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, reflection high-energy electron diffraction and atomic force microscopy measurements. The effects of annealing temperature and C 60 coverage on the SiC formation will be discussed. It is found that the C 60 molecules bond covalently with silicon, and the number of bonds increase upon increasing the annealing temperature. Annealing at T≥830°C entails the formation of stoichiometric silicon carbide clusters that coalesce to form a continuous SiC layer when the C 60 coverage is greater than one monolayer. Deep pits acting as silicon diffusion channels are present with dimensions that increase with the amounts of C 60. The interaction of C 60 with the SiC surface was also investigated. It is found that a similar covalent interaction is present in the two systems C 60/Si and C 60/SiC.

  20. Stacking faults in SiC nanowires.

    PubMed

    Wallis, K L; Wieligor, M; Zerda, T W; Stelmakh, S; Gierlotka, S; Palosz, B

    2008-07-01

    SiC nanowires were obtained by a reaction between vapor silicon and multiwall carbon nanotubes, CNT, in vacuum at 1200 degrees C. Raman and IR spectrometry, X-ray diffraction and high resolution transmission electron microscopy, HRTEM, were used to characterize properties of SiC nanowires. Morphology and chemical composition of the nanowires was similar for all samples, but concentration of structural defects varied and depended on the origin of CNT. Stacking faults were characterized by HRTEM and Raman spectroscopy, and both techniques provided complementary results. Raman microscopy allowed studying structural defects inside individual nanowires. A thin layer of amorphous silicon carbide was detected on the surface of nanowires. PMID:19051903

  1. Examples of conditional SIC-POVMs

    NASA Astrophysics Data System (ADS)

    Ohno, Hiromichi; Petz, Dénes

    2015-10-01

    The state of a quantum system is a density matrix with several parameters. The concern herein is how to recover the parameters. Several possibilities exist for the optimal recovery method, and we consider some special cases. We assume that a few parameters are known and that the others are to be recovered. The optimal positive-operator-valued measure (POVM) for recovering unknown parameters with an additional condition is called a conditional symmetric informationally complete POVM (SIC-POVM). In this paper, we study the existence or nonexistence of conditional SIC-POVMs. We provide a necessary condition for existence and some examples.

  2. Microwave joining of SiC

    SciTech Connect

    Silberglitt, R.; Ahmad, I.; Tian, Y.L.

    1997-04-01

    The purpose of this work is to optimize the properties of SiC-SiC joints made using microwave energy. The current focus is on identification of the most effective joining methods for scale-up to large tube assemblies, including joining using SiC produced in situ from chemical precursors. During FY 1996, a new microwave applicator was designed, fabricated and tested that provides the capability for vacuum baking of the specimens and insulation and for processing under inert environment. This applicator was used to join continuous fiber-reinforced (CFCC) SiC/SiC composites using a polymer precursor to form a SiC interlayer in situ.

  3. Saturn V S-IC (First) Stage

    NASA Technical Reports Server (NTRS)

    1967-01-01

    This illustration shows a cutaway drawing with callouts of the major components for the S-IC (first) stage of the Saturn V launch vehicle. The S-IC stage is 138 feet long and 33 feet in diameter, producing more than 7,500,000 pounds of thrust through five F-1 engines powered by liquid oxygen and kerosene. Four of the engines are mounted on an outer ring and gimball for control purposes. The fifth engine is rigidly mounted in the center. When ignited, the roar produced by the five engines equals the sound of 8,000,000 hi-fi sets.

  4. Saturn V S-IC (First) Stage

    NASA Technical Reports Server (NTRS)

    1968-01-01

    This is a cutaway view of the Saturn V first stage, known as the S-IC, detailing the five F-1 engines and fuel cells. The S-IC stage is 138 feet long and 33 feet in diameter, producing more than 7,500,000 pounds of thrust through the five F-1 engines that are powered by liquid oxygen and kerosene. Four of the engines are mounted on an outer ring and gimbal for control purposes. The fifth engine is rigidly mounted in the center. When ignited, the roar produced by the five engines equals the sound of 8,000,000 hi-fi sets.

  5. Saturn V S-IC (First) Stage

    NASA Technical Reports Server (NTRS)

    2004-01-01

    This cutaway illustration shows the Saturn V S-IC (first) stage with detailed callouts of the components. The S-IC Stage is 138 feet long and 33 feet in diameter, producing 7,500,000 pounds of thrust through five F-1 engines that are powered by liquid oxygen and kerosene. Four of the engines are mounted on an outer ring and gimbal for control purposes. The fifth engine is rigidly mounted in the center. When ignited, the roar produced by the five engines equals the sound of 8,000,000 hi-fi sets.

  6. S-IC Static Test Stand

    NASA Technical Reports Server (NTRS)

    1977-01-01

    Constructed in 1964, the S-IC Static Test Stand was designed to develop and test the first stage (S-IC) of the Saturn V launch vehicle. In the 1974 the test stand was modified to test the liquid hydrogen tank on the Space Shuttle External Tank. The facility was again modified in 1986 and its name was changed to the Advanced Engine Test Facility. These modifications were made to accommodate the Technology Test Bed engine which is a derivative of the Space Shuttle Main Engine.

  7. Structural Characterization of Polycrystalline 3C-SiC Films Prepared at High Rates by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Monomethylsilane

    NASA Astrophysics Data System (ADS)

    Kakiuchi, Hiroaki; Ohmi, Hiromasa; Nakamura, Ryota; Aketa, Masatoshi; Yasutake, Kiyoshi

    2006-10-01

    Polycrystalline cubic silicon carbide (3C-SiC) films were deposited at a relatively low temperature of 1070 K on Si(001) substrates by atmospheric pressure plasma chemical vapor deposition. Monomethylsilane (CH3SiH3) was used as the single source. CH4 and SiH4 dual sources were also used to compare deposition characteristics. Under the present deposition conditions, very high deposition rates of more than 3 nm/s were obtained. The structure of the SiC films was evaluated by reflection high-energy electron diffraction, Fourier transform infrared absorption spectroscopy and cross-sectional transmission electron microscopy. In addition, optical emission spectroscopy was employed to study the chemical reactions in the CH4/SiH4 and CH3SiH3 plasmas. The results showed that increasing H2 concentration is essential in forming a high quality 3C-SiC film by enhancing the hydrogen elimination reaction at the film-growing surface. From the optical emission spectra, it was found that atomic hydrogen generated by adding H2 in the plasma increase the amount of principal precursors for the film growth. The utilization of CH3SiH3 also led to a higher concentration of principal precursors in the plasma, enhancing the incorporation of Si-C bonds into the film. As a consequence of simultaneously using a high H2 concentration and the CH3SiH3 single source, the columnar growth of 3C-SiC crystallites was achieved.

  8. Microwave joining of SiC

    SciTech Connect

    Silberglitt, R.; Ahmad, I.; Black, W.M.

    1995-05-01

    The purpose of this work is to optimize the properties of SiC-SiC joints made using microwave energy. The current focus is on optimization of time-temperature profiles, production of SiC from chemical precursors, and design of new applicators for joining of long tubes.

  9. Universal Converter Using SiC

    SciTech Connect

    Dallas Marckx; Brian Ratliff; Amit Jain; Matthew Jones

    2007-01-01

    The grantee designed a high power (over 1MW) inverter for use in renewable and distributed energy systems, such as PV cells, fuel cells, variable speed wind turbines, micro turbines, variable speed gensets and various energy storage methods. The inverter uses 10,000V SiC power devices which enable the use of a straight-forward topology for medium voltage (4,160VAC) without the need to cascade devices or topologies as is done in all commercial, 4,160VAC inverters today. The use of medium voltage reduces the current by nearly an order of magnitude in all current carrying components of the energy system, thus reducing size and cost. The use of SiC not only enables medium voltage, but also the use of higher temperatures and switching frequencies, further reducing size and cost. In this project, the grantee addressed several technical issues that stand in the way of success. The two primary issues addressed are the determination of real heat losses in candidate SiC devices at elevated temperature and the development of high temperature packaging for SiC devices.

  10. Passive SiC irradiation temperature monitor

    SciTech Connect

    Youngblood, G.E.

    1996-04-01

    A new, improved passive irradiation temperature monitoring method was examined after an irradiation test at 627{degrees}C. The method is based on the analysis of thermal diffusivity changes during postirradiation annealing of polycrystalline SiC. Based on results from this test, several advantages for using this new method rather than a method based on length or lattice parameter changes are given.

  11. Development of SiC Large Tapered Crystal Growth

    NASA Technical Reports Server (NTRS)

    Neudeck, Phil

    2010-01-01

    Majority of very large potential benefits of wide band gap semiconductor power electronics have NOT been realized due in large part to high cost and high defect density of commercial wafers. Despite 20 years of development, present SiC wafer growth approach is yet to deliver majority of SiC's inherent performance and cost benefits to power systems. Commercial SiC power devices are significantly de-rated in order to function reliably due to the adverse effects of SiC crystal dislocation defects (thousands per sq cm) in the SiC wafer.

  12. P-V-T equation of state of SiC-3C: implications for primary pressure scale

    NASA Astrophysics Data System (ADS)

    Zhuravlev, Kirill; Goncharov, Alexander F.; Tkachev, Sergey; Dera, Przemyslaw; Prakapenka, Vitali; Geophysical Laboratory, Carnegie InstitutionScience Collaboration

    2014-03-01

    We present a new primary pressure scale based on concomitant measurements of the density and elastic parameters of the single crystal samples of cubic silicon carbide (3C-SiC) under quasi-hydrostatic pressures up to 65 GPa and 773 K. The established pressure scale has precision of 2%-4% up to 65 GPa and will allow more accurate pressure determination in that range than the previously used pressure scales. We also report x-ray diffraction data and Raman spectroscopy on 3C-SiC up to 75 GPa. We determined the P-V-T equation of state (EOS) of 3C-SiC and pressure and temperature dependencies of the zone-center phonons, elastic tensor, and mode Gruneisen parameters. Cubic SiC lattice was found to be stable up to 75 GPa, but there is a tendency for destabilization above 40 GPa, based on softening of a transverse sound velocity. We proposed corrections to the existing ruby and neon pressure scales, and also calibrated cubic SiC as an optical pressure marker using Raman spectroscopy. Presently with University of Hawaii.

  13. Graphene growth on SiC(000-1): optimization of surface preparation and growth conditions

    NASA Astrophysics Data System (ADS)

    Robinson, Zachary R.; Jernigan, Glenn G.; Bussmann, Konrad M.; Nyakiti, Luke O.; Garces, Nelson Y.; Nath, Anindya; Wheeler, Virginia D.; Myers-Ward, Rachael L.; Gaskill, D. K.; Eddy, Charles R.

    2015-09-01

    Graphene growth of high crystal quality and single-layer thickness can be achieved by low pressure sublimation (LPS) on SiC(0001). On SiC(0001), which is the C-terminated polar surface, there has been much less success growing uniform, single-layer films. In this work, a systematic study of surface preparation by hydrogen etching followed by LPS in an argon ambient was performed. Hydrogen etching is an important first step in the graphene growth process because it removes damage caused by polishing the substrate surface. However, for SiC(0001), etching at too high of a temperature or for too long has been found to result in pit formation due to the preferential etching of screw dislocations that intersect the surface. It was found that temperatures above 1450°C in 200mbar of hydrogen result in pitting of the surface, whereas etch temperatures at and below 1450°C can result in atomically at terraces of ~ 1 µm width. Following the hydrogen etch optimization, argon-mediated graphene growth was carried out at several different temperatures. For the growth experiments, pressure and growth time were both fixed. Regardless of growth temperature, all of the films were found to have non-uniform thickness. Further, x-ray photoelectron spectroscopy and low energy electron diffraction measurements reveal that trace amounts of oxygen, which may be present during growth, significantly affects the graphene growth process on this polar surface.

  14. S-IC Test Stand Design Model

    NASA Technical Reports Server (NTRS)

    1962-01-01

    At its founding, the Marshall Space Flight Center (MSFC) inherited the Army's Jupiter and Redstone test stands, but much larger facilities were needed for the giant stages of the Saturn V. From 1960 to 1964, the existing stands were remodeled and a sizable new test area was developed. The new comprehensive test complex for propulsion and structural dynamics was unique within the nation and the free world, and they remain so today because they were constructed with foresight to meet the future as well as on going needs. Construction of the S-IC Static test stand complex began in 1961 in the west test area of MSFC, and was completed in 1964. The S-IC static test stand was designed to develop and test the 138-ft long and 33-ft diameter Saturn V S-IC first stage, or booster stage, weighing in at 280,000 pounds. Required to hold down the brute force of a 7,500,000-pound thrust produced by 5 F-1 engines, the S-IC static test stand was designed and constructed with the strength of hundreds of tons of steel and 12,000,000 pounds of cement, planted down to bedrock 40 feet below ground level. The foundation walls, constructed with concrete and steel, are 4 feet thick. The base structure consists of four towers with 40-foot-thick walls extending upward 144 feet above ground level. The structure was topped by a crane with a 135-foot boom. With the boom in the upright position, the stand was given an overall height of 405 feet, placing it among the highest structures in Alabama at the time. This photo is of the S-IC test stand design model created prior to construction.

  15. S-IC Test Stand Design Model

    NASA Technical Reports Server (NTRS)

    1962-01-01

    At its founding, the Marshall Space Flight Center (MSFC) inherited the Army's Jupiter and Redstone test stands, but much larger facilities were needed for the giant stages of the Saturn V. From 1960 to 1964, the existing stands were remodeled and a sizable new test area was developed. The new comprehensive test complex for propulsion and structural dynamics was unique within the nation and the free world, and they remain so today because they were constructed with foresight to meet the future as well as on going needs. Construction of the S-IC Static test stand complex began in 1961 in the west test area of MSFC, and was completed in 1964. The S-IC static test stand was designed to develop and test the 138-ft long and 33-ft diameter Saturn V S-IC first stage, or booster stage, weighing in at 280,000 pounds. Required to hold down the brute force of a 7,500,000-pound thrust produced by 5 F-1 engines, the S-IC static test stand was designed and constructed with the strength of hundreds of tons of steel and 12,000,000 pounds of cement, planted down to bedrock 40 feet below ground level. The foundation walls, constructed with concrete and steel, are 4 feet thick. The base structure consists of four towers with 40-foot-thick walls extending upward 144 feet above ground level. The structure was topped by a crane with a 135-foot boom. With the boom in the upright position, the stand was given an overall height of 405 feet, placing it among the highest structures in Alabama at the time. This photo is of the S-IC test stand design model.

  16. Infrared spectra of meteoritic SiC grains

    NASA Astrophysics Data System (ADS)

    Andersen, A. C.; Jäger, C.; Mutschke, H.; Braatz, A.; Clément, D.; Henning, Th.; Jørgensen, U. G.; Ott, U.

    1999-03-01

    We present here the first infrared spectra of meteoritic SiC grains. The mid-infrared transmission spectra of meteoritic SiC grains isolated from the Murchison meteorite were measured in the wavelength range 2.5-16.5 mu m, in order to make available the optical properties of presolar SiC grains. These grains are most likely stellar condensates with an origin predominately in carbon stars. Measurements were performed on two different extractions of presolar SiC from the Murchison meteorite. The two samples show very different spectral appearance due to different grain size distributions. The spectral feature of the smaller meteoritic SiC grains is a relatively broad absorption band found between the longitudinal and transverse lattice vibration modes around 11.3 mu m, supporting the current interpretation about the presence of SiC grains in carbon stars. In contrast to this, the spectral feature of the large (> 5 mu m) grains has an extinction minimum around 10 mu m. The obtained spectra are compared with commercially available SiC grains and the differences are discussed. This comparison shows that the crystal structure (e.g., beta -SiC versus alpha -SiC) of SiC grains plays a minor role on the optical signature of SiC grains compared to e.g. grain size.

  17. Synthesis of SiC nanorods from bleached wood pulp

    SciTech Connect

    Shin, Yongsoon; Wang, Chong M.; Samuels, William D.; Exarhos, Gregory J.

    2007-05-01

    Unbleached and bleached soft wood pulps have been used as templates and carbon precursors to produce SiC nanorods. Hydrolyzed tetraethylorthosilicate (TEOS), Silicic acid was infiltrated into the pulps followed by a carbothermal reduction to form SiC nanorods at 1400oC in Ar. Residual carbon formed along with SiC was removed by gasification at 700oC in air. The SiC materials prepared from unbleached pulp were non-uniform SiC with a thick SiO2 coating, while the SiC nanorods prepared from the bleached pulp were uniform and straight with dimensions of 250 nm in diameter and 5.0 mm long. The formation of uniform camelback structure of SiC in the reaction between silica and bleached pulp is attributed to more silica deposited in the amorphous region of cellulose.

  18. Post-growth thermal oxidation of wurtzite InN thin films into body-center cubic In{sub 2}O{sub 3} for chemical/gas sensing applications

    SciTech Connect

    Liu, H.F.; Yakovlev, N.L.; Chi, D.Z.; Liu, W.

    2014-06-01

    Post-growth thermal oxidations of InN have been studied using high-resolution x-ray diffraction (HRXRD) and secondary ion-mass spectroscopy (SIMS). The InN thin films, having relative high crystal quality, were grown by metal–organic chemical vapor deposition (MOCVD) on c-sapphire substrates using InGaN/GaN buffer layers. HRXRD reveals that oxidation of wurtzite InN into body-center cubic In{sub 2}O{sub 3} occurred at elevated temperatures. A Si{sub 3}N{sub 4} encapsulation improves the crystal quality of In{sub 2}O{sub 3} oxidized by using conventional rapid thermal annealing (RTA) but it results in the presence of undesired metallic indium. Cycle-RTA not only improves the crystal quality but also avoids the byproduct of metallic indium. SIMS depth profile, using contaminate elements as the ‘interface markers,’ provide evidence that the oxidation of InN is dominated by oxygen inward diffusion mechanism. Together with the HRXRD results, we conclude that the crystal quality of the resultant In{sub 2}O{sub 3}/InN heterostructure is mainly controlled by the balance between the speeds of oxygen diffusion and InN thermal dissociation, which can be effectively tuned by cycle-RTA. The obtained In{sub 2}O{sub 3}/InN heterostructures can be fundamental materials for studying high speed chemical/gas sensing devices. - Graphical abstract: Oxidation of h-InN into bcc-In{sub 2}O{sub 3} has been realized at elevated temperatures. A Si{sub 3}N{sub 4} cap improves the crystal quality of In{sub 2}O{sub 3} oxidized by conventional RTA but it results in the presence of undesired metallic indium. Cycle-RTA not only improves the crystal quality but also avoids the byproduct of metallic indium. SIMS depth profiles provide evidence that the oxidation of InN is dominated by oxygen inward diffusion mechanism. The crystal quality of the resultant In{sub 2}O{sub 3}/InN heterostructure is mainly controlled by the balance between the speeds of oxygen diffusion and InN thermal

  19. Multilayer epitaxial graphene grown on the SiC (000- 1) surface; structure and electronic properties

    SciTech Connect

    Sprinkle, M.; Hicks, J.; Tejeda, A.; Taleb-Ibrahimi, A.; Le Fevre, P.; Bertran, F.; Tinkey, H.; Clark, M.C.; Soukiassian, P.; Martinotti, D.; Hass, J.; Conrad, E.H.

    2010-10-22

    We review the progress towards developing epitaxial graphene as a material for carbon electronics. In particular, we discuss improvements in epitaxial graphene growth, interface control and the understanding of multilayer epitaxial graphene's (MEG's) electronic properties. Although graphene grown on both polar faces of SiC will be discussed, our discussions will focus on graphene grown on the (000{bar 1}) C-face of SiC. The unique properties of C-face MEG have become apparent. These films behave electronically like a stack of nearly independent graphene sheets rather than a thin Bernal stacked graphite sample. The origins of multilayer graphene's electronic behaviour are its unique highly ordered stacking of non-Bernal rotated graphene planes. While these rotations do not significantly affect the inter-layer interactions, they do break the stacking symmetry of graphite. It is this broken symmetry that leads to each sheet behaving like isolated graphene planes.

  20. Reactive Plasma Etching of SiC in a Tetrafluoroethane / Oxygen Plasma

    NASA Astrophysics Data System (ADS)

    Galloway, Heather C.; Radican, Kevin P.; Donnelly, David; Koeck, Deborah C.

    2003-03-01

    The etch rate as a function of oxygen concentration was investigated in the RF magnetron plasma etching of SiC with tetrafluoroethane gas. The etch rate and surface roughness was measured with atomic force microscopy, while evidence of polymer deposition was analyzed with FTIR. Etch rates of > 10 nm/sec can be achieved with high selectivity with respect to an aluminum mask, near infinite selectivity with respect to silicon. This has also been found to be compatible with some low-k dielectric films. Tetrafluoroethane is of interest due to its high fluorine content. It is also a nontoxic, ozone friendly gas with a short atmospheric lifetime. The role of oxygen in the etching process will be discussed and this etching process will be compared to other SiC etches that have been previously reported

  1. SiC Sensors in Extreme Environments: Real-time Hydrogen Monitoring for Energy Plant Applications

    NASA Astrophysics Data System (ADS)

    Ghosh, Ruby

    2008-03-01

    Clean, efficient energy production, such as the gasification of coal (syngas), requires physical and chemical sensors for exhaust gas monitoring as well as real-time control of the combustion process. Wide-bandgap semiconducting materials systems can meet the sensing demands in these extreme environments consisting of chemically corrosive gases at high temperature and pressure. We have developed a SiC based micro-sensor for detection of hydrogen containing species with millisecond response at 600 C. The sensor is a Pt-SiO2-SiC device with a dense Pt catalytic sensing film, capable of withstanding months of continuous high temperature operation. The device was characterized in robust sensing module that is compatible with an industrial reactor. We report on the performance of the SiC sensor in a simulated syngas ambient at 370 C containing the common interferants CO2, CH4 and CO [1]. In addition we demonstrate that hours of exposure to >=1000 ppm H2S and 15% water vapor does not degrade the sensor performance. To elucidate the mechanisms responsible for the hydrogen response of the sensor we have modeled the hydrogen adsorptions kinetics at the internal Pt-SiO2 interface, using both the Tempkin and Langmuir isotherms. Under the conditions appropriate for energy plant applications, the response of our sensor is significantly larger than that obtained from ultra-high vacuum electrochemical sensor measurements at high temperatures. We will discuss the role of morphology, at the nano to micro scale, on the enhanced catalytic activity observed for our Pt sensing films in response to a heated hydrogen gas stream at atmospheric pressure. [1] R. Loloee, B. Chorpening, S. Beers & R. Ghosh, Hydrogen monitoring for power plant applications using SiC sensors, Sens. Actuators B:Chem. (2007), doi:10.1016/j.snb.2007.07.118

  2. Corrosion resistance of sintered NdFeB coated with SiC/Al bilayer thin films by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Huang, Yiqin; Li, Heqin; Zuo, Min; Tao, Lei; Wang, Wei; Zhang, Jing; Tang, Qiong; Bai, Peiwen

    2016-07-01

    The poor corrosion resistance of sintered NdFeB imposes a great challenge in industrial applications. In this work, the SiC/Al bilayer thin films with the thickness of 510 nm were deposited on sintered NdFeB by magnetron sputtering to improve the corrosion resistance. A 100 nm Al buffer film was used to reduce the internal stress between SiC and NdFeB and improve the surface roughness of the SiC thin film. The morphologies and structures of SiC/Al bilayer thin films and SiC monolayer film were investigated with FESEM, AFM and X-ray diffraction. The corrosion behaviors of sintered NdFeB coated with SiC monolayer film and SiC/Al bilayer thin films were analyzed by polarization curves. The magnetic properties were measured with an ultra-high coercivity permanent magnet pulse tester. The results show that the surface of SiC/Al bilayer thin films is more compact and uniform than that of SiC monolayer film. The corrosion current densities of SiC/Al bilayer films coated on NdFeB in acid, alkali and salt solutions are much lower than that of SiC monolayer film. The SiC/Al bilayer thin films have little influence to the magnetic properties of NdFeB.

  3. High Cubic-Phase Purity InN on MgO (001) Using Cubic-Phase GaN as a Buffer Layer

    SciTech Connect

    Sanorpim, S.; Kuntharin, S.; Parinyataramas, J.; Yaguchi, H.; Iwahashi, Y.; Orihara, M.; Hijikata, Y.; Yoshida, S.

    2011-12-23

    High cubic-phase purity InN films were grown on MgO (001) substrates by molecular beam epitaxy with a cubic-phase GaN buffer layer. The cubic phase purity of the InN grown layers has been analyzed by high resolution X-ray diffraction, {mu}-Raman scattering and transmission electron microscopy. It is evidenced that the hexagonal-phase content in the InN overlayer much depends on hexagonal-phase content in the cubic-phase GaN buffer layer and increases with increasing the hexagonal-phase GaN content. From Raman scattering measurements, in addition, the InN layer with lowest hexagonal component (6%), only Raman characteristics of cubic TO{sub InN} and LO{sub InN} modes were observed, indicating a formation of a small amount of stacking faults, which does not affect on vibrational property.

  4. Structure and composition of silicon carbide films synthesized by ion implantation

    NASA Astrophysics Data System (ADS)

    Nussupov, K. Kh.; Beisenkhanov, N. B.; Zharikov, S. K.; Beisembetov, I. K.; Kenzhaliev, B. K.; Akhmetov, T. K.; Seitov, B. Zh.

    2014-11-01

    The mathematical decomposition of the IR absorption spectrum obtained from a Si layer after the C+ ion implantation with an energy of 10 or 40 keV or from a homogeneous SiC0.7 film has demonstrated that fractions of weak elongated Si-C bonds in the amorphous phase, strong shortened Si-C bonds on the surface of small nanocrystals, and tetrahedral Si-C bonds in the crystalline phase (degree of crystallinity) after high-temperature annealing (1250-1400°C) of the layers are equal to 29/29/42, 22/7/71, and 21/31/48%, respectively. A system of SiC2.0, SiO2, SiC0.8, and SiC0.6 layers in the film on the Si substrate has been identified using X-ray reflectometry and the simulation with the Release software. The reflectometry data on fluctuations of the intensity of X-ray reflections in the region of the main maximum have been interpreted in terms of variations in the density over the depth of the layer with a Gaussian distribution of carbon atoms from 2.55 and 2.90 g/cm3 for the SiC0.25 and SiC0.65 layers, respectively, to 3.29 g/cm3 for the SiC1.36 layer.

  5. Tensile strength of SiC fibers

    SciTech Connect

    Zok, F.W.; Chen, X.; Weber, C.H.

    1995-07-01

    An experimental investigation has been conducted on the effects of gauge length on the tensile strength of SiC fibers. The results show that the overall strength distribution cannot be described solely in terms of the two-parameter Weibull function. The overall distribution is found to be consistent with two concurrent flaw populations, one of them being characteristic of the pristine fibers, and the other characteristic of the additional flaws introduced into the fiber during processing of the composite.

  6. Periodically twinned SiC nanowires.

    PubMed

    Wang, Dong-Hua; Xu, Di; Wang, Qing; Hao, Ya-Juan; Jin, Guo-Qiang; Guo, Xiang-Yun; Tu, K N

    2008-05-28

    Twinning has been recognized to be an important microstructural defect in nanoscale materials. Periodically twinned SiC nanowires were largely synthesized by the carbothermal reduction of a carbonaceous silica xerogel prepared from tetraethoxysilane and biphenyl with iron nitrate as an additive. The twinned β-SiC nanowires, with a hexagonal cross section, a diameter of 50-300 nm and a length of tens to hundreds of micrometers, feature a zigzag arrangement of periodically twinned segments with a rather uniform thickness along the entire growth length. Computer simulation has been used to generate three-dimensional atomic structures of the zigzag columnar twin structure by the stacking of hexagonal discs of {111} planes of SiC. A minimum surface energy and strain energy argument is proposed to explain the formation of periodic twins in the SiC nanowires. The thickness of the periodic twinned segments is found to be linearly proportional to the nanowire diameter, and a constant volume model is proposed to explain the relation. PMID:21730575

  7. Direct current conduction in SiC powders

    NASA Astrophysics Data System (ADS)

    Mârtensson, E.; Gäfvert, U.; Lindefelt, U.

    2001-09-01

    Silicon carbide (SiC) powder is used in nonlinear field grading materials. The composite material, consisting of an insulating polymer matrix filled with the SiC-grains, is usually a percolated system with established conducting paths. In order to explain the properties, the electrical characteristic and conduction mechanisms of the SiC powder itself are of interest. SiC powders have been studied by current-voltage measurements and the influences of grain size and doping have been investigated. The macroscopic current characteristics of green and black SiC powders can be described by the transport mechanisms at the grain contacts, which can be modeled by Schottky-like barriers. The SiC is heavily doped and tunneling by field emission is the dominating conduction mechanism over the major part of the nonlinear voltage range. It is suggested that preavalanche multiplication influences the current at the highest voltages, especially for p-type black SiC.

  8. SiC nanowires synthesized from graphene and silicon vapors

    NASA Astrophysics Data System (ADS)

    Weichenpei, Luo; Gong-yi, Li; Zengyong, Chu; Tianjiao, Hu; Xiaodong, Li; Xuefei, Zhang

    2016-04-01

    The preparation of silicon carbide (SiC) nanowires is basically important for its potential applications in nanodevices, nanocomposites, etc. In the present work, a simple route was reported to synthesize SiC nanowires by heating commercial graphene with silicon vapors and no catalyst. Characterization by scanning electron microscopy, transmission electron microscopy, high-resolution transmission electron microscopy, electron energy scattering, X-ray diffraction, and Raman dispersive spectrum demonstrates the products are composed of β-SiC crystal. The SiC nanowires have the average diameter of about 50 nm and length of tens of micrometers. The vapor-solid mechanism was employed to interpret the SiC nanowires growth. Gaseous SiO which was produced by the reaction of Si powders with its surface oxidation reacted with the solid graphene to form SiC crystal nuclei. And SiC crystal nuclei would act as active sites for further growing into nanowires.

  9. Ultralight, Strong, Three-Dimensional SiC Structures.

    PubMed

    Chabi, Sakineh; Rocha, Victoria G; García-Tuñón, Esther; Ferraro, Claudio; Saiz, Eduardo; Xia, Yongde; Zhu, Yanqiu

    2016-02-23

    Ultralight and strong three-dimensional (3D) silicon carbide (SiC) structures have been generated by the carbothermal reduction of SiO with a graphene foam (GF). The resulting SiC foams have an average height of 2 mm and density ranging between 9 and 17 mg cm(-3). They are the lightest reported SiC structures. They consist of hollow struts made from ultrathin SiC flakes and long 1D SiC nanowires growing from the trusses, edges, and defect sites between layers. AFM results revealed an average flake thickness of 2-3 nm and lateral size of 2 μm. In-situ compression tests in the scanning electron microscope (SEM) show that, compared with most of the existing lightweight foams, the present 3D SiC exhibited superior compression strengths and significant recovery after compression strains of about 70%. PMID:26580985

  10. Properties of interfaces between cubic and hexagonal polytypes of silicon carbide

    NASA Astrophysics Data System (ADS)

    Raffy, C.; Furthmüller, J.; Bechstedt, F.

    2002-12-01

    We present ab initio calculations of the properties of two types of interface between the cubic and hexagonal (wurtzite) polytypes of silicon carbide. The results are derived from density-functional calculations within the local-density approximation and the pseudopotential-plane-wave approach. We first study the interface along the (111) plane (corresponding to (0001) in the hexagonal representation) perpendicular to the stacking axis of the bilayers. Then we consider the interface along the (115) plane, which was already identified experimentally as a grain boundary in silicon and germanium. The (115) interfaces are especially interesting, since they may contribute to a quantum wire consisting of an inclusion of cubic SiC in hexagonal SiC. They are made up of five-and seven-membered atom rings and are free of dangling bonds. The cubic and hexagonal grains are tilted with respect to one another by an angle of 38.94°. In both cases of interfaces, the electronic properties are discussed. Whereas the (111) interface induces practically no states in the bulk fundamental gaps, the particular structure of the (115) interface generates a lot of states, resulting in a metallic behaviour.

  11. Silicon threshold displacement energy determined by photoluminescence in electron-irradiated cubic silicon carbide

    SciTech Connect

    Lefevre, Jeremie; Esnouf, Stephane; Petite, Guillaume; Costantini, Jean-Marc

    2009-01-15

    In view of the potential use of silicon carbide (SiC) in the nuclear industry, it is of major interest to understand point defect formation in this material. This work is a contribution to the determination of the silicon threshold displacement energy in the cubic polytype of SiC using electron irradiations with increasing energies from 275 to 680 keV. The photoluminescence signal of the silicon vacancy was related to the number of displacements per atom in the silicon sublattice. This quantity was calculated taking into account the energy loss and angular dispersion of electrons in the target. A best fit of experimental data was obtained for a displacement cross section using a threshold displacement energy of 25 eV along the [100] lattice direction. We checked the relevance of this result by comparing the experimental concentration of silicon single vacancies measured by electron paramagnetic resonance spectroscopy with the theoretical number of displaced silicon atoms.

  12. F-1 Engine Installation to S-IC Stage

    NASA Technical Reports Server (NTRS)

    1965-01-01

    Engineers and technicians at the Marshall Space Flight Center were installing an F-I engine on the Saturn V S-IC (first) stage thrust structure in building 4705. The S-IC (first) stage used five F-1 engines that produced a total thrust of 7,500,000 pounds as each engine produced 1,500,000 pounds of thrust. The S-IC stage lifted the Saturn V vehicle and Apollo spacecraft from the launch pad.

  13. Large area supersonic jet epitaxy of AlN, GaN, and SiC on silicon

    SciTech Connect

    Lauhon, L.J.; Ustin, S.A.; Ho, W.

    1997-12-31

    AlN, GaN, and SiC thin films were grown on 100 mm diameter Si(111) and Si(100) substrates using Supersonic Jet Epitaxy (SJE). Precursor gases were seeded in lighter mass carrier gases and free jets were formed using novel slit-jet apertures. The jet design, combined with substrate rotation, allowed for a uniform flux distribution over a large area of a 100 mm wafer at growth pressures of 1--20 mTorr. Triethylaluminum, triethylgallium, and ammonia were used for nitride growth, while disilane, acetylene, and methylsilane were used for SiC growth. The films were characterized by in situ optical reflectivity, x-ray diffraction (XRD), atomic force microscopy (AFM), and spectroscopic ellipsometry (SE).

  14. Execution of energy efficient detection of hydrogen using Pt/WO x /SiC semiconductor structure

    NASA Astrophysics Data System (ADS)

    Zuev, V. V.; Demin, M. V.; Fominskii, V. Yu.; Romanov, R. I.; Grigor'ev, V. V.; Nevolin, V. N.

    2015-09-01

    It has been shown that, at elevated temperatures (˜350°C), the most distinct response to H2 from the thin film structure Pt/WO x /SiC is achieved at registration of change in voltage for the reverse branch of a current-voltage characteristic. Comparative studies of electric current conduction through the structure and over its surface (with deposited Pt film) have led to the conclusion that a change in properties of the Pt/WO x and WO x /SiC interfaces under action of H2 mostly determines efficiency of response of the structure in the case of "transverse" measuring geometry. In the case of a 2% concentration of H2 in air the voltage shift for the reverse branch at a current of ˜10 μA reached 5 V against 2 V on the forward branch and "planar" geometry of measurements.

  15. Microstructure of GaN epitaxy on SiC using AlN buffer layers

    SciTech Connect

    Ponce, F.A.; Krusor, B.S.; Major, J.S. Jr.; Plano, W.E.; Welch, D.F.

    1995-07-17

    The crystalline structure of GaN epilayers on (0001) SiC substrates has been studied using x-ray diffraction and transmission microscopy. The films were grown by metalorganic chemical vapor deposition, using AlN buffer layers. X-ray diffraction measurements show negligible strain in the epilayer, and a long-range variation in orientation. Transmission electron lattice images show that the AlN buffer layer consists of small crystallites. The nature of the buffer layer and its interfaces with the substrate and the GaN film is discussed. The defect structure of the GaN film away from the substrate consists mostly of threading dislocations with a density of {similar_to}10{sup 9} cm{sup {minus}2}. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  16. Graphene covered SiC powder as advanced photocatalytic material

    NASA Astrophysics Data System (ADS)

    Zhu, Kaixing; Guo, Liwei; Lin, Jingjing; Hao, Weichang; Shang, Jun; Jia, Yuping; Chen, Lianlian; Jin, Shifeng; Wang, Wenjun; Chen, Xiaolong

    2012-01-01

    Graphene covered SiC powder (GCSP) has been fabricated by well established method of high temperature thermal decomposition of SiC. The structural and photocatalystic characteristics of the prepared GCSP were investigated and compared with that of the pristine SiC powder. Under UV illumination, more than 100% enhancement in photocatalystic activity is achieved in degradation of Rhodamine B (Rh B) by GCSP catalyst than by pristine SiC powder. The possible mechanisms underlining the observed results are discussed. The results suggested that GCSP as a composite of graphene based material has great potential for use as a high performance photocatalyst.

  17. Paralinear Oxidation of CVD SiC in Water Vapor

    NASA Technical Reports Server (NTRS)

    Opila, Elizabeth J.; Hann, Raiford E., Jr.

    1997-01-01

    The oxidation kinetics of CVD SiC were monitored by thermogravimetric analysis (TGA) in a 50% H2O/50% O2 gas mixture flowing at 4.4 cm/s for temperatures between 1200 and 1400 C. Paralinear weight change kinetics were observed as the water vapor oxidized the SiC and simultaneously volatilized the silica scale. The long-term degradation rate of SiC is determined by the volatility of the silica scale. Rapid SiC surface recession rates were estimated from these data for actual aircraft engine combustor conditions.

  18. SiC Power MOSFET with Improved Gate Dielectric

    SciTech Connect

    Sbrockey, Nick M; Tompa, Gary S; Spencer, Michael G; Chandrashekhar, Chandra MVS

    2010-08-23

    In this STTR program, Structured Materials Industries (SMI), and Cornell University are developing novel gate oxide technology, as a critical enabler for silicon carbide (SiC) devices. SiC is a wide bandgap semiconductor material, with many unique properties. SiC devices are ideally suited for high-power, highvoltage, high-frequency, high-temperature and radiation resistant applications. The DOE has expressed interest in developing SiC devices for use in extreme environments, in high energy physics applications and in power generation. The development of transistors based on the Metal Oxide Semiconductor Field Effect Transistor (MOSFET) structure will be critical to these applications.

  19. Basics of luminescent diagnostics of the dislocation structure of SiC crystals

    NASA Astrophysics Data System (ADS)

    Gorban, Ivan S.; Mishinova, Galina N.

    1998-04-01

    The result of the studies of dislocation luminescence in SiC crystals are presented in the report. This semiconductor forms great number of polytypes which differs by periodical alternation of cubic and hexagonal layers in basic planes. High probability of periodic pack infringement caused by very little energy of stacking fault leads to variation of dislocation structures in different glide planes of this crystals. Shockly and Frank partial dislocations are sufficiently important. The dislocation luminescence as growth origin so as dislocations included in result of plastic deformation or high temperature annealing. In this case the spectra of dislocation luminescence are the indicators of processes of phase transitions. The influence of impurities on the dislocation luminescence centers is investigated. The models of structure of dislocation centers and the mechanism of radiative transitions are proposed.

  20. Effect of van der Waals interactions on the stability of SiC polytypes

    NASA Astrophysics Data System (ADS)

    Kawanishi, Sakiko; Mizoguchi, Teruyasu

    2016-05-01

    Density functional theory calculations with a correction of the long-range dispersion force, namely, the van der Waals (vdW) force, are performed for SiC polytypes. The lattice parameters are in good agreement with those obtained from the experiments. Furthermore, the stability of the polytypes in the experiments, which show 3C-SiC as the most stable, is reproduced by the present calculations. The effects of the vdW force on the electronic structure and the stability of polytypes are discussed. We observe that the vdW interaction is more sensitive to the cubic site than the hexagonal site. Thus, the influence of the vdW force increases with decreasing the hexagonality of the polytype, which results in the confirmation that the most stable polytype is 3C-SiC.

  1. Si diffusion path for pit-free graphene growth on SiC(0001)

    NASA Astrophysics Data System (ADS)

    Sun, G. F.; Liu, Y.; Rhim, S. H.; Jia, J. F.; Xue, Q. K.; Weinert, M.; Li, L.

    2011-11-01

    Density functional theory calculations reveal that the interfacial 63 × 63 structure [a warped graphene layer with periodic inclusions of pentagon-hexagon-heptagon (H5,6,7) defects] facilitates a Si diffusion path vertically through the interface layer during epitaxial growth of graphene on SiC(0001). The calculated diffusion barrier is 4.7 eV, competitive with Si interstitial diffusion of ˜3.5 eV in SiC [M. Bockstedte , Phys. Rev. BPRBMDO1098-012110.1103/PhysRevB.68.205201 68, 205201 (2003)]. Scanning tunneling microscopy study shows that, for growth in an Ar background, where Si desorption is suppressed and all diffusion channels contribute, graphene films with reduced pit density can be grown on nominally flat SiC substrates. On the other hand, for Si diffusion-limited growth in ultrahigh vacuum, the Si interstitial diffusion is the energetically favorable path where the step edges serve as the necessary outlet toward Si desorption. The much higher density of step edges on vicinal substrates also facilitates the growth of pit-free graphene.

  2. Nanocrystalline SiC and Ti3SiC2 Alloys for Reactor Materials: Diffusion of Fission Product Surrogates

    SciTech Connect

    Henager, Charles H.; Jiang, Weilin

    2014-11-01

    MAX phases, such as titanium silicon carbide (Ti3SiC2), have a unique combination of both metallic and ceramic properties, which make them attractive for potential nuclear applications. Ti3SiC2 has been suggested in the literature as a possible fuel cladding material. Prior to the application, it is necessary to investigate diffusivities of fission products in the ternary compound at elevated temperatures. This study attempts to obtain relevant data and make an initial assessment for Ti3SiC2. Ion implantation was used to introduce fission product surrogates (Ag and Cs) and a noble metal (Au) in Ti3SiC2, SiC, and a dual-phase nanocomposite of Ti3SiC2/SiC synthesized at PNNL. Thermal annealing and in-situ Rutherford backscattering spectrometry (RBS) were employed to study the diffusivity of the various implanted species in the materials. In-situ RBS study of Ti3SiC2 implanted with Au ions at various temperatures was also performed. The experimental results indicate that the implanted Ag in SiC is immobile up to the highest temperature (1273 K) applied in this study; in contrast, significant out-diffusion of both Ag and Au in MAX phase Ti3SiC2 occurs during ion implantation at 873 K. Cs in Ti3SiC2 is found to diffuse during post-irradiation annealing at 973 K, and noticeable Cs release from the sample is observed. This study may suggest caution in using Ti3SiC2 as a fuel cladding material for advanced nuclear reactors operating at very high temperatures. Further studies of the related materials are recommended.

  3. SIC-BASED HYDROGEN SELECTIVE MEMBRANES FOR WATER-GAS-SHIFT REACTION

    SciTech Connect

    Paul K.T. Liu

    2003-12-01

    A hydrogen selective membrane as a membrane reactor (MR) can significantly improve the power generation efficiency with a reduced capital and operating cost for the waster-gas-shift reaction. Existing hydrogen selective ceramic membranes are not suitable for the proposed MR due to their poor hydrothermal stability. In this project we have focused on the development of innovative silicon carbide (SiC) based hydrogen selective membranes, which can potentially overcome this technical barrier. SiC macro-porous membranes have been successfully fabricated via extrusion of commercially available SiC powder. Also, an SiC hydrogen selective thin film was prepared via our CVD/I technique. This composite membrane demonstrated excellent hydrogen selectivity at high temperature ({approx}600 C). More importantly, this membrane also exhibited a much improved hydrothermal stability at 600 C with 50% steam (atmospheric pressure) for nearly 100 hours. In parallel, we have explored an alternative approach to develop a H{sub 2} selective SiC membrane via pyrolysis of selected pre-ceramic polymers and sol-gel techniques. Building upon the positive progress made in the membrane development study, we conducted an optimization study to develop an H{sub 2} selective SiC membrane with sufficient hydrothermal stability suitable for the WGS environment. In addition, mathematical simulation has been performed to compare the performance of the membrane reactor (MR) vs conventional packed bed reactor for WGS reaction. Our result demonstrates that >99.999% conversion can be accomplished via WGS-MR using the hydrogen selective membrane developed by us. Further, water/CO ratio can be reduced, and >97% hydrogen recovery and <200 ppm CO can be accomplished according to the mathematical simulation. Thus, we believe that the operating economics of WGS can be improved significantly based upon the proposed MR concept. In parallel, gas separations and hydrothermal and long-term-storage stability of the

  4. CVD scaled up for commercial production of bulk SiC

    SciTech Connect

    Not Available

    1993-03-01

    A recent development at Morton International's Advanced Materials group is having a revolutionary impact on the materials world. The firm has successfully scaled production of bulk, cubic ([beta]), chemically vapor deposited (CVD) silicon carbide (SiC) to support commercial requirements. To date, they have produced free standing CVD SiC substrates in sheets up to 60 in. across and over one inch thick. The material can also be grown as smaller near-net-shape parts in many different popular geometries. The parts produced by the process are monolithic. Commercially known as CVD SILICON CARBIDE, the material is single phase, theoretically dense, and 99.999% pure, [beta]-SiC. These characteristics lead to superior product attributes such as high values of hardness, flexural strength, and thermal conductivity. Additionally, the product has demonstrated superior oxidation resistance, and polishability. Several markets have shown an interest in the material including: optics, wear parts, information storage, and electronic packaging. Other applications for the material are emerging on what seems like a daily basis.

  5. KeV Ion Beam Induced Surface Modification of SiC Hydrogen Sensor

    SciTech Connect

    Muntele, C.I.; Ila, D.; Williams, E.K.; Poker, D.B.; Hensley, D.K.

    1999-11-29

    Silicon carbide, a wide-bandgap semiconductor, is currently used to fabricate an efficient high temperature hydrogen sensor. When a palladium coating is applied on the exposed surface of silicon carbide, the chemical reaction between palladium and hydrogen produces a detectable change in the surface chemical potential. Rather than applying a palladium film, we have implanted palladium ions into the silicon face of 6H, n-type Sic samples. The implantation energies and fluences, as well as the results obtained by monitoring the current through the sample in the presence of hydrogen are included in this paper.

  6. Electronic structure of epitaxial graphene layers on SiC: effects of the substrate

    SciTech Connect

    Varchon, F.; Feng, R.; Hass, J.; Li, X.; Nguyen, B. Ngoc; Naud, C.; Mallet, P.; Veuillen, J.-Y.; Berger, C.; Conrad, E.H.; Magaud, L.

    2008-10-17

    A strong substrate-graphite bond is found in the first all-carbon layer by density functional theory calculations and x-ray diffraction for few graphene layers grown epitaxially on SiC. This first layer is devoid of graphene electronic properties and acts as a buffer layer. The graphene nature of the film is recovered by the second carbon layer grown on both the (0001) and (0001{sup -}) 4H-SiC surfaces. We also present evidence of a charge transfer that depends on the interface geometry. Hence the graphene is doped and a gap opens at the Dirac point after three Bernal stacked carbon layers are formed.

  7. Resolution of the SiC problem: astronomical and meteoritic evidence reconciled

    NASA Astrophysics Data System (ADS)

    Speck, A. K.; Hofmeister, A. M.; Barlow, M. J.

    Pre-solar grains of silicon carbide found in meteorites and interpreted as having had an origin around carbon stars from their isotopic composition, have all been found to be of the beta-SiC polytype. Yet to date all fits to the 11.3-microns SiC emission band of carbon stars have been obtained only for alpha-SiC grains. We show that this discrepancy has arisen from inappropriate `KBr corrections' having been made to laboratory spectra of SiC particles dispersed in KBr matrices, this error having propagated through the astronomical literature. We demonstrate that thin film infrared (IR) absorption spectra measured in a diamond anvil cell for both the alpha- and beta-polymorphs of synthetic SiC have positions nearly identical to those obtained previously from finely ground samples in KBr. Hence, it is unnecessary to correct for the presence of a medium if IR spectra of powder dispersions are obtained from dilute, very fine grain sizes. We re-fit a sample of carbon star mid-IR spectra, using laboratory data with no KBr correction applied, and show that beta -SiC grains fit the observations, while alpha-SiC grains do not. The discrepancy between meteoritic and astronomical identifications of the SiC-type is therefore removed. Our results imply that the IR data used by astronomers to identify other dust species should be carefully scrutinized to ensure that the KBr correction factor has not caused other misidentifications of minerals with astronomical dust features.

  8. Alternate current characteristics of SiC powders

    NASA Astrophysics Data System (ADS)

    Mârtensson, E.; Gäfvert, U.; Önneby, C.

    2001-09-01

    Silicon carbide (SiC) powder is used in nonlinear field grading materials. The composite material, consisting of an insulating polymer matrix filled with the SiC grains, is usually a percolated system with established conducting paths. In order to explain the properties, the electrical characteristic of the SiC powder itself is of interest. The ac characteristics of SiC powders have been studied by dielectric response, capacitance-voltage, and ac-pulse measurements. The frequency, electric field, and pressure dependencies have been analyzed for green and black SiC, which have different doping. The ac characteristics of green and black SiC powders are governed by both the barrier regions at the SiC-grain contacts and the surrounding matrix. The nonlinear loss is determined by the conduction current at the contacts. Depending on the doping level of the SiC grains, the capacitance may be controlled by either the nonlinear capacitance of the barrier region or the linear capacitance of the surrounding matrix. Each contact zone may be modeled by a nonlinear resistance in parallel with both a nonlinear and a linear capacitance. The components are considered to be frequency independent. However, in order to explain the macroscopic frequency and field dependencies of the SiC powders, the use of a network of unique contact zones with dissimilar properties is suggested.

  9. Saturn V S-IC Stage LOX Tank

    NASA Technical Reports Server (NTRS)

    1964-01-01

    This image depicts the Saturn V S-IC (first) stage liquid oxygen (LOX) tank being lowered into the irner tank in a high bay at the Marshall Space Flight Center (MSFC). The S-IC stage utilized five F-1 engines that used liquid oxygen and kerosene as propellant and provided a combined thrust of 7,500,000 pounds.

  10. Porous silicon carbide (SiC) semiconductor device

    NASA Technical Reports Server (NTRS)

    Shor, Joseph S. (Inventor); Kurtz, Anthony D. (Inventor)

    1994-01-01

    A semiconductor device employs at least one layer of semiconducting porous silicon carbide (SiC). The porous SiC layer has a monocrystalline structure wherein the pore sizes, shapes, and spacing are determined by the processing conditions. In one embodiment, the semiconductor device is a p-n junction diode in which a layer of n-type SiC is positioned on a p-type layer of SiC, with the p-type layer positioned on a layer of silicon dioxide. Because of the UV luminescent properties of the semiconducting porous SiC layer, it may also be utilized for other devices such as LEDs and optoelectronic devices.