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Sample records for doped gaas schottky

  1. The influence of a doping profile on the characteristics of an ion-implanted GaAs field-effect transistor with a Schottky barrier

    SciTech Connect

    Shestakov, A. K. Zhuravlev, K. S.

    2011-12-15

    A GaAs field-effect ion-implanted transistor with a Schottky barrier is simulated. The doping profile obtained when doping through an insulator mask is determined and the dependences of the static transistor characteristics on the parameters of the doping profile are calculated and analyzed. The physical processes controlling the transistor characteristics in the case of a variation in the parameters of its doping profile and the coefficient of compensation of the substrate are studied. Based on calculations, the optimal doping-profile parameters ensuring the best characteristics for transistors are predicted.

  2. GaAs Schottky barrier varactor diodes for submillimeter wavelength power generation

    NASA Technical Reports Server (NTRS)

    Crowe, T. W.; Peatman, W. C. B.; Winkler, E.

    1991-01-01

    The development of GaAs Schottky barrier diodes for frequencies well into the submillimeter wavelength range is discussed. These devices have the highest cutoff frequencies yet obtained for varactor diodes and have produced sufficient output power to drive Schottky mixers at frequencies as high as 640 GHz. The fundamental design tradeoff between cutoff frequency and capacitance modulation is explored. As the doping density is increased and the anode diameter is reduced, the dynamic cutoff frequency increases, reaching a maximum of roughly 5 THz. It is concluded that the maximum output frequency from harmonic multipliers based on standard GaAs varactor diodes will be about 1 THz.

  3. Neutron radiation effects in GaAs planar doped barrier diodes

    SciTech Connect

    Kearney, M.J.; Couch, N.R. ); Edwards, M. ); Dale, I. )

    1993-04-01

    The planar doped barrier (PDB) diode has recently been shown to be a very attractive alternative to the Schottky diode for many microwave and millimeter-wave mixer and detector applications. The authors have studied the degradation of GaAs planar doped barrier diodes subject to neutron irradiation. For fluences as high as 10[sup 15] cm[sup [minus]2] the diode characteristics are very well preserved, which strengthens the rationale for using these devices in place of Schottky diodes in harsh working environments such as nuclear instrumentation and space.

  4. Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier

    DOEpatents

    Carlson, David E.; Wronski, Christopher R.

    1979-01-01

    A Schottky barrier amorphous silicon solar cell incorporating a thin highly doped p-type region of hydrogenated amorphous silicon disposed between a Schottky barrier high work function metal and the intrinsic region of hydrogenated amorphous silicon wherein said high work function metal and said thin highly doped p-type region forms a surface barrier junction with the intrinsic amorphous silicon layer. The thickness and concentration of p-type dopants in said p-type region are selected so that said p-type region is fully ionized by the Schottky barrier high work function metal. The thin highly doped p-type region has been found to increase the open circuit voltage and current of the photovoltaic device.

  5. Photoluminescence of Mn+ doped GaAs

    NASA Astrophysics Data System (ADS)

    Zhou, Huiying; Qu, Shengchun; Liao, Shuzhi; Zhang, Fasheng; Liu, Junpeng; Wang, Zhanguo

    2010-10-01

    Photoluminescence is one of the most useful techniques to obtain information about optoelectronic properties and defect structures of materials. In this work, the room-temperature and low temperature photoluminescence of Mn-doped GaAs were investigated, respectively. Mn-doped GaAs structure materials were prepared by Mn+ ion implantation at room temperature into GaAs. The implanted samples were subsequently annealed at various temperatures under N2 atmosphere to recrystallize the samples and remove implant damage. A strong peak was found for the sample annealed at 950 °C for 5 s. Transitions near 0.989 eV (1254 nm), 1.155 eV (1074 nm) and 1.329 eV (933 nm) were identified and formation of these emissions was analyzed for all prepared samples. This structure material could have myriad applications, including information storage, magnet-optical properties and energy level engineering.

  6. Tight-binding study of quantum transport in nanoscale GaAs Schottky MOSFET

    NASA Astrophysics Data System (ADS)

    Zahra, Ahangari; Morteza, Fathipour

    2013-09-01

    This paper explores the band structure effect to elucidate the feasibility of an ultra-scaled GaAs Schottky MOSFET (SBFET) in a nanoscale regime. We have employed a 20-band sp3d5 s* tight-binding (TB) approach to compute E — K dispersion. The considerable difference between the extracted effective masses from the TB approach and bulk values implies that quantum confinement affects the device performance. Beside high injection velocity, the ultra-scaled GaAs SBFET suffers from a low conduction band DOS in the Γ valley that results in serious degradation of the gate capacitance. Quantum confinement also results in an increment of the effective Schottky barrier height (SBH). Enhanced Schottky barriers form a double barrier potential well along the channel that leads to resonant tunneling and alters the normal operation of the SBFET. Major factors that may lead to resonant tunneling are investigated. Resonant tunneling occurs at low temperatures and low drain voltages, and gradually diminishes as the channel thickness and the gate length scale down. Accordingly, the GaAs (100) SBFET has poor ballistic performance in nanoscale regime.

  7. Circuit Compatible Model for Electrostatic Doped Schottky Barrier CNTFET

    NASA Astrophysics Data System (ADS)

    Singh, Amandeep; Khosla, Mamta; Raj, Balwinder

    2016-06-01

    This paper proposes a circuit compatible model for electrostatic doped Schottky barrier carbon nanotube field effect transistor (ED-SBCNTFET). The proposed model is an extension of the Schottky barrier carbon nanotube field effect transistor (SBCNTFET) to ED-SBCNTFET by adding polarity gates, which are used to create electrostatic doping. In ED-SBCNTFET, electrostatic doping is responsible for a fermi level shift of source and drain regions. A mathematical relation has been developed between fermi level shift and polarity gate bias. Both current-voltage (I-V) and capacitance-voltage (C-V) characteristics have been efficiently modeled. The results are compared with the reported semi-classical model and simulations from NanoTCAD ViDES for validation. The proposed model is much faster than numerical models as it denies self consistent equations. Finally, circuit application is demonstrated by simulating inverter using the proposed model in HSPICE.

  8. Au and Al Schottky barrier formation on GaAs (100) surfaces prepared by thermal desorption of a protective arsenic coating

    SciTech Connect

    Spindt, C.J.; Yamada, M.; Meissner, P.L.; Miyano, K.E.; Herrera, A.; Spicer, W.E. . Stanford Electronics Labs.); Arko, A.J. ); Woodall, J.M.; Pettit, G.D. . Thomas J. Watson Research Center)

    1991-01-01

    Photoelectron spectroscopy has been used as a tool to investigate the initial stages of Schottky barrier formation on GaAs (100) surfaces. This is a popular technique that has been used by many researchers in the past to measure the band bending (or shift) of the valence band and conduction band (a measure of the Schottky barrier shift), while the Fermi level remains fixed at the system ground (i.e., the ground of the spectrometer). Metal deposition on a semiconductor surface can alter the Schottky barrier at the surface and pin the Fermi level near the middle of the energy gap. Extremely clean and crystallographically perfect surfaces are required in this study. Toward this end, a method of protecting the GaAs surface was employed which consists of capping the GaAs surface with a layer of As. Upon introduction into the high vacuum system the As is thermally desorbed, revealing a pure GaAs surface. Our work was motivated by a previous study (Brillson et al) on similarly capped specimens, which suggested that metal overlayers do not pin the Schottky barrier in GaAs. Barrier heights varied by as much as 0.75 eV between Al and Au overlayers. This large energy range is a striking result in view of the fact that a considerable number of prior studies on both (110) and (100) surfaces have found that all metals will pin within a narrow (0.25 eV) range at midgap. We repeated the measurements of Brillson on the identically doped samples used in their study using two extreme range metals of Au and Al as overlayers. We found that the barrier height measurements on low doped n-type samples used in this work and in the previous work are affected by photovoltaic effects, even at room temperature. This was determined from taking spectra at a number of temperatures between 20 K and room temperature and looking for shifts. 16 refs., 7 figs.

  9. A millimeter wave large-signal model of GaAs planar Schottky varactor diodes

    NASA Astrophysics Data System (ADS)

    Junrong, Dong; Jie, Huang; Chao, Tian; Hao, Yang; Haiying, Zhang

    2011-03-01

    A millimeter wave large-signal model of GaAs planar Schottky varactor diodes based on a physical analysis is presented. The model consists of nonlinear resistances and capacitances of the junction region and external parasitic parameters. By analyzing the characteristics of the diode under reverse and forward bias, an extraction procedure of all of the parameters is addressed. To validate the newly proposed model, the PSVDs were fabricated based on a planar process and were measured using an automatic network analyzer. Measurement shows that the model exactly represents the behavior of GaAs PSVDs under a wide bias condition from -10 to 0.6 V and for frequencies up to 40 GHz.

  10. GaAs MESFET with lateral non-uniform doping

    NASA Technical Reports Server (NTRS)

    Wang, Y. C.; Bahrami, M.

    1983-01-01

    An analytical model of the GaAs MESFET with arbitrary non-uniform doping is presented. Numerical results for linear lateral doping profile are given as a special case. Theoretical considerations predict that better device linearity and improved F(T) can be obtained by using linear lateral doping when doping density increases from source to drain.

  11. Controllable GMR device in a δ-doped, magnetically and electrically modulated, GaAs /Alx Ga1-x As heterostructure

    NASA Astrophysics Data System (ADS)

    Shen, Li-Hua; Zhang, Gui-Lian; Yang, Duan-Chui

    2016-09-01

    We report on a theoretical study of giant magnetoresistance (GMR) effect in a δ-doped GaAs /Alx Ga1-x As heterostructure modulated by two stripes of ferromagnetic metal and a stripe of Schottky metal in parallel configuration. The δ-doping dependent transmission and conductance of the device are calculated. It is shown that a considerable giant magnetoresistance (GMR) effect exists in this structure. It is also shown that the magnetoresistance ratio (MR) can be switched by the δ-doping. The underlying physical mechanism of the results is analysed in light of δ-doping-dependent tunneling process in the device.

  12. Amorphous silicon Schottky barrier solar cells incorporating a thin insulating layer and a thin doped layer

    DOEpatents

    Carlson, David E.

    1980-01-01

    Amorphous silicon Schottky barrier solar cells which incorporate a thin insulating layer and a thin doped layer adjacent to the junction forming metal layer exhibit increased open circuit voltages compared to standard rectifying junction metal devices, i.e., Schottky barrier devices, and rectifying junction metal insulating silicon devices, i.e., MIS devices.

  13. Doping-Spike PtSi Schottky Infrared Detectors with Extended Cutoff Wavelengths

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; Park, J. S.; Gunapala, S. D.; Jones, E. W.; Castillo, H. M. Del

    1994-01-01

    A technique incorporating a p+ doping spike at the silicide/Si interface to reduce the effective Schottky barrier of the silicide infrared detectors and thus extend the cutoff wavelength has been developed.

  14. Photoluminescence of Si-doped GaAs epitaxial layers

    SciTech Connect

    Yaremenko, N. G. Karachevtseva, M. V.; Strakhov, V. A.; Galiev, G. B.; Mokerov, V. G.

    2008-12-15

    The effect of arsenic pressure on the amphoteric behavior of Si during the growth of the Si-doped (100)-, (111)Ga-, and (111)As-oriented GaAs layers is studied by photoluminescence spectroscopy. The edge luminescence band is examined, and the concentration and the degree of compensation as functions of the arsenic pressure are determined. Nonstoichiometry defects in GaAs layers grown with a deficit and an excess of arsenic are studied. It is shown that the defects formed in the (111)Ga- and (111)As-oriented layers are different in nature.

  15. Photoluminescence of Be implanted Si-doped GaAs

    SciTech Connect

    Kroon, R.E.; Botha, J.R.; Neethling, J.H.; Drummond, T.J.

    1999-11-12

    Degenerately doped n-type GaAs produces band-to-band luminescence with the peak energy dependent on the carrier concentration. In this study the photoluminescence of Si-doped GaAs is examined after implantation with high energy Be ions and annealing. The band-to-band peak energy in the unimplanted (reference) material is shown to be smaller than reported values in Te-doped GaAs of the same carrier concentration. This is attributed to compensation in the Si doped material as a result of its amphoteric nature. For the implanted samples, no luminescence was recorded for the unannealed samples or those annealed at 400 C and 500 C. Comparing the relative peak intensities from material annealed at 600 C for 15 min and 30 min indicates an increase in the number of As vacancies with anneal time. For samples annealed at 700 C and 800 C, the dominant luminescence is associated with Ga{sub As} antisite defects. It is suggested that formation of these defects occurs predominantly only at these higher temperatures. Crystal recovery as measured by the luminescence intensity increased with both anneal temperature and time. For the implanted sample annealed at 800 C for 15 min, the dominant peak height was 25% of that from the reference sample.

  16. Semi-insulating GaAs and Au Schottky barrier photodetectors for near-infrared detection (1280 nm)

    NASA Astrophysics Data System (ADS)

    Nusir, A. I.; Makableh, Y. F.; Manasreh, O.

    2015-08-01

    Schottky barriers formed between metal (Au) and semiconductor (GaAs) can be used to detect photons with energy lower than the bandgap of the semiconductor. In this study, photodetectors based on Schottky barriers were fabricated and characterized for the detection of light at wavelength of 1280 nm. The device structure consists of three gold fingers with 1.75 mm long and separated by 0.95 mm, creating an E shape while the middle finger is disconnected from the outer frame. When the device is biased, electric field is stretched between the middle finger and the two outermost electrodes. The device was characterized by measuring the current-voltage (I-V) curve at room temperature. This showed low dark current on the order of 10-10 A, while the photocurrent was higher than the dark current by four orders of magnitude. The detectivity of the device at room temperature was extracted from the I-V curve and estimated to be on the order of 5.3x1010 cm.Hz0.5/W at 5 V. The step response of the device was measured from time-resolved photocurrent curve at 5 V bias with multiple on/off cycles. From which the average recovery time was estimated to be 0.63 second when the photocurrent decreases by four orders of magnitude, and the average rise time was measured to be 0.897 second. Furthermore, the spectral response spectrum of the device exhibits a strong peak close to the optical communication wavelength (~1.3 μm), which is attributed to the internal photoemission of electrons above the Schottky barrier formed between Au and GaAs.

  17. Schottky barrier formation at the Au to rare earth doped GaN thin film interface

    NASA Astrophysics Data System (ADS)

    McHale, S. R.; McClory, J. W.; Petrosky, J. C.; Wu, J.; Rivera, A.; Palai, R.; Losovyj, Ya. B.; Dowben, P. A.

    2011-09-01

    The Schottky barriers formed at the interface between gold and various rare earth doped GaN thin films (RE = Yb, Er, Gd) were investigated in situ using synchrotron photoemission spectroscopy. The resultant Schottky barrier heights were measured as 1.68 ± 0.1 eV (Yb:GaN), 1.64 ± 0.1 eV (Er:GaN), and 1.33 ± 0.1 eV (Gd:GaN). We find compelling evidence that thin layers of gold do not wet and uniformly cover the GaN surface, even with rare earth doping of the GaN. Furthermore, the trend of the Schottky barrier heights follows the trend of the rare earth metal work function.

  18. Highly Conducting Gallium-Doped ZnO Thin Film as Transparent Schottky Contact for Organic- Semiconductor-Based Schottky Diodes

    NASA Astrophysics Data System (ADS)

    Singh, Budhi; Ghosh, Subhasis

    2015-08-01

    Highly conducting and transparent Ga-doped ZnO (GZO) thin films have been grown on transparent substrates at different growth temperatures with Ga content varying from 0.01% to 10%. All films showed pronounced c-axis orientation corresponding to hexagonal wurtzite structure. The minimum resistivity of 4.3 × 10-4 Ω cm was reproducibly obtained in GZO thin film doped with 2% Ga and grown at 600°C. We have further shown that highly conducting transparent GZO thin film can be used as a Schottky contact in copper phthalocyanine (CuPc)-based Schottky diodes. The capacitance-voltage characteristics of the Al/CuPc/Au and GZO/CuPc/Au Schottky diodes show similar built-in potential ( V bi) of 0.98 V, which is close to the difference in work function between Au (5.2 eV) and Al or GZO (4.2 eV), establishing that GZO behaves as a metal electrode with work function similar to Al. Similar values of acceptor concentration (˜1015 cm-3) in CuPc were obtained from the capacitance-voltage characteristics of the Al/CuPc/Au and GZO/CuPc/Au Schottky diodes. These observations indicate the absence of interface states at the metal/organic interface in CuPc-based Schottky diodes.

  19. Optimum doping achieves high quantum yields in GaAs photoemitters

    NASA Technical Reports Server (NTRS)

    Sonnenberg, H.

    1971-01-01

    Experimental data indicate that optimum doping exists. Measured quantum yield curves indicate optimum overall response is obtained in GaAs emitters with doping in high 10 to the 18th power per cu cm range. Doping for optimum response is not necessarily in this range.

  20. Doping incorporation paths in catalyst-free Be-doped GaAs nanowires

    SciTech Connect

    Casadei, Alberto; Heiss, Martin; Colombo, Carlo; Ruelle, Thibaud; Fontcuberta i Morral, Anna; Krogstrup, Peter; Roehr, Jason A.; Upadhyay, Shivendra; Sorensen, Claus B.; Nygard, Jesper

    2013-01-07

    The incorporation paths of Be in GaAs nanowires grown by the Ga-assisted method in molecular beam epitaxy have been investigated by electrical measurements of nanowires with different doping profiles. We find that Be atoms incorporate preferentially via the nanowire side facets, while the incorporation path through the Ga droplet is negligible. We also show that Be can diffuse into the volume of the nanowire giving an alternative incorporation path. This work is an important step towards controlled doping of nanowires and will serve as a help for designing future devices based on nanowires.

  1. Spectrally dependent photovoltages in Schottky photodiode based on (100) B-doped diamond

    SciTech Connect

    Čermák, Jan Rezek, Bohuslav; Koide, Yasuo; Takeuchi, Daisuke

    2014-02-07

    Spectrally and spatially resolved photovoltages were measured by Kelvin probe force microscopy (KPFM) on a Schottky photo-diode made of a 4 nm thin tungsten-carbide (WC) layer on a 500 nm oxygen-terminated boron-doped diamond epitaxial layer (O-BDD) that was grown on a Ib (100) diamond substrate. The diode was grounded by the sideways ohmic contact (Ti/WC), and the semitransparent Schottky contact was let unconnected. The electrical potentials across the device were measured in dark (only 650 nm LED of KPFM being on), under broad-band white light (halogen lamp), UV (365 nm diode), and deep ultraviolet (deuterium lamp) illumination. Illumination induced shift of the electrical potential remains within 210 mV. We propose that the photovoltage actually corresponds to a shift of Fermi level inside the BDD channel and thereby explains orders of magnitude changes in photocurrent.

  2. A novel ultra steep dynamically reconfigurable electrostatically doped silicon nanowire Schottky Barrier FET

    NASA Astrophysics Data System (ADS)

    Singh, Sangeeta; Sinha, Ruchir; Kondekar, P. N.

    2016-05-01

    In this paper, an ultra steep, symmetric and dynamically configurable, electrostatically doped silicon nanowire Schottky FET (E-SiNW-SB-FET) based on dopant-free technology is investigated. It achieves the ultra steep sub-threshold slope (SS) due to the cumulative effect of weak impact-ionization induced positive feedback and electrostatic modulation of Schottky barrier heights at both source and drain terminals. It consists of axial nanowire heterostructure (silicide-intrinsic silicon-silicide) with three independent all-around gates, two gates are polarity control gates for dynamically reconfiguring the device polarity by modulating the effective Schottky barrier heights and a control gate switches the device ON and OFF. The most interesting features of the proposed structure are simplified fabrication process as the state-of-the-art for ion implantation and high thermal budget no more required for annealing. It is highly immune to process variations, doping control issues and random dopant fluctuations (RDF) and there are no mobility degradation issues related to high doping. A calibrated 3-D TCAD simulation results exhibit the SS of 2 mV/dec for n-type E-SiNW-SB-FET and 9 mV/dec for p-type E-SiNW-SB-FET for about five decades of current. Further, it resolves all the reliability related issues of IMOS as hot electron effects are no more limiting our device performance. It offers significant drive current of the order of 10-5-10-4 A and magnificently high ION/IOFF ratio of ∼108 along with the inherent advantages of symmetric device structure for its circuit realization.

  3. Design Considerations for Heavily-Doped Cryogenic Schottky Diode Varactor Multipliers

    NASA Technical Reports Server (NTRS)

    Schlecht, E.; Maiwald, F.; Chattopadhyay, G.; Martin, S.; Mehdi, I.

    2001-01-01

    Diode modeling for Schottky varactor frequency multipliers above 500 GHz is presented with special emphasis placed on simple models and fitted equations for rapid circuit design. Temperature- and doping-dependent mobility, resistivity, and avalanche current multiplication and breakdown are presented. Next is a discussion of static junction current, including the effects of tunneling as well as thermionic emission. These results have been compared to detailed measurements made down to 80 K on diodes fabricated at JPL, followed by a discussion of the effect on multiplier efficiency. Finally, a simple model of current saturation in the undepleted active layer suitable for inclusion in harmonic balance simulators is derived.

  4. Comparative research on the transmission-mode GaAs photocathodes of exponential-doping structures

    NASA Astrophysics Data System (ADS)

    Chen, Liang; Qian, Yun-Sheng; Zhang, Yi-Jun; Chang, Ben-Kang

    2012-03-01

    Early research has shown that the varied doping structures of the active layer of GaAs photocathodes have been proven to have a higher quantum efficiency than uniform doping structures. On the basis of our early research on the surface photovoltage of GaAs photocathodes, and comparative research before and after activation of reflection-mode GaAs photocathodes, we further the comparative research on transmission-mode GaAs photocathodes. An exponential doping structure is the typical varied doping structure that can form a uniform electric field in the active layer. By solving the one-dimensional diffusion equation for no equilibrium minority carriers of transmission-mode GaAs photocathodes of the exponential doping structure, we can obtain the equations for the surface photovoltage (SPV) curve before activation and the spectral response curve (SRC) after activation. Through experiments and fitting calculations for the designed material, the body-material parameters can be well fitted by the SPV before activation, and proven by the fitting calculation for SRC after activation. Through the comparative research before and after activation, the average surface escape probability (SEP) can also be well fitted. This comparative research method can measure the body parameters and the value of SEP for the transmission-mode GaAs photocathode more exactly than the early method, which only measures the body parameters by SRC after activation. It can also help us to deeply study and exactly measure the parameters of the varied doping structures for transmission-mode GaAs photocathodes, and optimize the Cs-O activation technique in the future.

  5. Raman study of As outgassing and damage induced by ion implantation in Zn-doped GaAs

    SciTech Connect

    Barba, D.; Aimez, V.; Beauvais, J.; Beerens, J.; Drouin, D.; Chicoine, M.; Schiettekatte, F.

    2004-11-01

    Room temperature micro-Raman investigations of LO phonon and LO phonon-plasmon coupling is used to study the As outgassing mechanism and the disordering effects induced by ion implantation in Zn-doped GaAs with nominal doping level p=7x10{sup 18} cm{sup -3}. The relative intensity of these two peaks is measured right after rapid vacuum thermal annealings (RVTA) between 200 and 450 deg. C, or after ion implantations carried out at energies of 40 keV with P{sup +}, and at 90 and 170 keV with As{sup +}. These intensities provide information regarding the Schottky barrier formation near the sample surface. Namely, the Raman signature of the depletion layer formation resulting from As desorption is clearly observed in samples submitted to RVTA above 300 deg. C, and the depletion layer depths measured in ion implanted GaAs:Zn are consistent with the damage profiles obtained through Monte Carlo simulations. Ion channeling effects, maximized for a tilt angle set to 45 deg. during implantation, are also investigated. These results show that the Raman spectroscopy is a versatile tool to study the defects induced by postgrowth processes in multilayered heterostructures, with probing range of about 100 nm in GaAs-based materials.

  6. Structural and optical characterization of Mg-doped GaAs nanowires grown on GaAs and Si substrates

    SciTech Connect

    Falcão, B. P. Leitão, J. P.; Correia, M. R.; Soares, M. R.; Morales, F. M.; Mánuel, J. M.; Garcia, R.; Gustafsson, A.; Moreira, M. V. B.; Oliveira, A. G. de; González, J. C.

    2013-11-14

    We report an investigation on the morphological, structural, and optical properties of large size wurtzite GaAs nanowires, low doped with Mg, grown on GaAs(111)B and Si(111) substrates. A higher density of vertical nanowires was observed when grown upon GaAs(111)B. Very thin zinc-blende segments are observed along the axis of the nanowires with a slightly higher linear density being found on the nanowires grown on Si(111). Low temperature cathodoluminescence and photoluminescence measurements reveal an emission in the range 1.40–1.52 eV related with the spatial localization of the charge carriers at the interfaces of the two crystalline phases. Mg related emission is evidenced by cathodoluminescence performed on the GaAs epilayer. However, no direct evidence for a Mg related emission is found for the nanowires. The excitation power dependency on both peak energy and intensity of the photoluminescence gives a clear evidence for the type II nature of the radiative transitions. From the temperature dependence on the photoluminescence intensity, non-radiative de-excitation channels with different activation energies were found. The fact that the estimated energies for the escape of the electron are higher in the nanowires grown on Si(111) suggests the presence of wider zinc-blende segments.

  7. Design and characterisations of double-channel GaAs pHEMT Schottky diodes based on vertically stacked MMICs for a receiver protection limiter

    NASA Astrophysics Data System (ADS)

    Haris, Norshakila; Kyabaggu, Peter B. K.; Rezazadeh, Ali A.

    2016-07-01

    A microwave receiver protection limiter circuit has been designed, fabricated and tested using vertically stacked GaAs MMIC technology. The limiter circuit with a dimension of 2.5 × 1.3 mm2 is formed by using double-channel AlGaAs/InGaAs pseudomorphic HEMT (pHEMT) Schottky diodes integrated with a low-loss V-shaped coplanar waveguide multilayer structure. The electrical parameter characteristics of the pHEMT Schottky diodes are presented including the C–V profile showing the presence of a double channel in the device layer structure. This unique feature can also be seen from the double-peak responses of the electron density as a function of the device layer width, which represent the high electron concentration at two different 2-DEG layers of the structure. An equivalent circuit model of pHEMT Schottky diodes is demonstrated showing good agreement with the measurement results. At zero-bias condition, the devices show high performance in diode detector applications with voltage sensitivities of more than 89 mV μW‑1 at 10 GHz and at least 5.4 mV μW‑1 at 35 GHz. The measurement results of the limiter circuit demonstrated the blocking of input power signals greater than 20 dBm input power at 3 GHz. To the best of our knowledge this is the first demonstration of the use of pHEMT Schottky diodes in microwave power limiter applications.

  8. Inversion of spin dependent photocurrent at Fe3O4/modulation doped GaAs heterointerfaces

    NASA Astrophysics Data System (ADS)

    Shirahata, Y.; Wada, E.; Itoh, M.; Taniyama, T.

    2011-04-01

    We demonstrate inversion of the spin dependent photocurrent across an Fe3O4/modulation doped GaAs interface under optical spin orientation condition. The spin dependent photocurrent for fully epitaxial Fe3O4/GaAs and Fe/GaAs interfaces clearly show the opposite magnetic field dependence, where the spin filtering efficiency for the Fe3O4/GaAs decreases with increasing magnetic field. The results clearly indicate that the spin polarization of the Fe3O4 layer has the opposite sign to that of Fe at the Fermi energy, consistent with theoretical predictions, and the result is a consequence of the atomically flat Fe3O4/GaAs interface we obtained.

  9. Te-doping of self-catalyzed GaAs nanowires

    SciTech Connect

    Suomalainen, S. Hakkarainen, T. V.; Salminen, T.; Koskinen, R.; Guina, Mircea; Honkanen, M.; Luna, E.

    2015-07-06

    Tellurium (Te)-doping of self-catalyzed GaAs nanowires (NWs) grown by molecular beam epitaxy is reported. The effect of Te-doping on the morphological and crystal structure of the NWs is investigated by scanning electron microscopy and high-resolution transmission electron microscopy. The study reveals that the lateral growth rate increases and axial growth rate decreases with increasing Te doping level. The changes in the NW morphology can be reverted to some extent by changing the growth temperature. At high doping levels, formation of twinning superlattice is observed alongside with the (111)-facetted sidewalls. Finally, the incorporation of Te is confirmed by Raman spectroscopy.

  10. Visible-light electroluminescence in Mn-doped GaAs light-emitting diodes

    NASA Astrophysics Data System (ADS)

    Nam Hai, Pham; Maruo, Daiki; Tanaka, Masaaki

    2014-03-01

    We observed visible-light electroluminescence (EL) due to d-d transitions in light-emitting diodes with Mn-doped GaAs layers (here, referred to as GaAs:Mn). Besides the band-gap emission of GaAs, the EL spectra show two peaks at 1.89 eV and 2.16 eV, which are exactly the same as 4A2(4F) → 4T1(4G) and 4T1(4G) → 6A1(6S) transitions of Mn atoms doped in ZnS. The temperature dependence and the current-density dependence are consistent with the characteristics of d-d transitions. We explain the observed EL spectra by the p-d hybridized orbitals of the Mn d electrons in GaAs.

  11. An Integrated 520-600 GHz Sub-Harmonic Mixer and Tripler Combination Based on GaAs MMIC Membrane Planar Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Thomas, B.; Gill, J.; Maestrini, A.; Lee, C.; Lin, R.; Sin, S.; Peralta, A.; Mehdi, I.

    2010-01-01

    We present here the design, development and test of an integrated sub-millimeter front-end featuring a 520-600 GHz sub-harmonic mixer and a 260-300 GHz frequency tripler in a single cavity. Both devices used GaAs MMIC membrane planar Schottky diode technology. The sub-harmonic mixer/tripler circuit has been tested using conventional machined as well as silicon micro-machined blocks. Measurement results on the metal block give best DSB mixer noise temperature of 2360 K and conversion losses of 7.7 dB at 520 GHz. Preliminary results on the silicon micro-machined blocks give a DSB mixer noise temperature of 4860 K and conversion losses of 12.16 dB at 540 GHz. The LO input power required to pump the integrated tripler/sub-harmonic mixer for both packages is between 30 and 50 mW.

  12. An Integrated 520-600 GHz Sub-Harmonic Mixer and Tripler Combination Based on GaAs MMIC Membrane Planar Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Thomas, B.; Gill, J.; Maestrini, A.; Lee, C.; Lin, R.; Sin, S.; Peralta, A.; Mehdi, I.

    2011-01-01

    We present here the design, development and test of an integrated sub-millimeter front-end featuring a 520-600 GHz sub-harmonic mixer and a 260-300 GHz frequency tripler in a single cavity. Both devices used GaAs MMIC membrane planar Schottky diode technology. The sub-harmonic mixer/tripler circuit has been tested using conventional machined as well as silicon micro-machined blocks. Measurement results on the metal block give best DSB mixer noise temperature of 2360 K and conversion losses of 7.7 dB at 520 GHz. Preliminary results on the silicon micro-machined blocks give a DSB mixer noise temperature of 4860 K and conversion losses of 12.16 dB at 540 GHz. The LO input power required to pump the integrated tripler/sub-harmonic mixer for both packages is between 30 and 50 mW

  13. Increased Photoconductivity Lifetime in GaAs Nanowires by Controlled n-Type and p-Type Doping.

    PubMed

    Boland, Jessica L; Casadei, Alberto; Tütüncüoglu, Gözde; Matteini, Federico; Davies, Christopher L; Jabeen, Fauzia; Joyce, Hannah J; Herz, Laura M; Fontcuberta I Morral, Anna; Johnston, Michael B

    2016-04-26

    Controlled doping of GaAs nanowires is crucial for the development of nanowire-based electronic and optoelectronic devices. Here, we present a noncontact method based on time-resolved terahertz photoconductivity for assessing n- and p-type doping efficiency in nanowires. Using this technique, we measure extrinsic electron and hole concentrations in excess of 10(18) cm(-3) for GaAs nanowires with n-type and p-type doped shells. Furthermore, we show that controlled doping can significantly increase the photoconductivity lifetime of GaAs nanowires by over an order of magnitude: from 0.13 ns in undoped nanowires to 3.8 and 2.5 ns in n-doped and p-doped nanowires, respectively. Thus, controlled doping can be used to reduce the effects of parasitic surface recombination in optoelectronic nanowire devices, which is promising for nanowire devices, such as solar cells and nanowire lasers. PMID:26959350

  14. Design of quantum efficiency measurement system for variable doping GaAs photocathode

    NASA Astrophysics Data System (ADS)

    Chen, Liang; Yang, Kai; Liu, HongLin; Chang, Benkang

    2008-03-01

    To achieve high quantum efficiency and good stability has been a main direction to develop GaAs photocathode recently. Through early research, we proved that variable doping structure is executable and practical, and has great potential. In order to optimize variable doping GaAs photocathode preparation techniques and study the variable doping theory deeply, a real-time quantum efficiency measurement system for GaAs Photocathode has been designed. The system uses FPGA (Field-programmable gate array) device, and high speed A/D converter to design a high signal noise ratio and high speed data acquisition card. ARM (Advanced RISC Machines) core processor s3c2410 and real-time embedded system are used to obtain and show measurement results. The measurement precision of photocurrent could reach 1nA, and measurement range of spectral response curve is within 400~1000nm. GaAs photocathode preparation process can be real-time monitored by using this system. This system could easily be added other functions to show the physic variation of photocathode during the preparation process more roundly in the future.

  15. Heterodimensional Schottky contacts to modulation-doped heterojunction with application to photodetection

    NASA Astrophysics Data System (ADS)

    Seddik, Amro Anwar

    The growing technological demand for high speed and compact integrated electronics and Optics is a pressing challenge. Speed and compactness necessitate low power consumption semiconductors with high transport mobility carriers, with potential of ultra large-scale integration of electronic and Optoelectronics circuitry. One avenue to fulfill these requirements is to utilize reduced dimensionality where carriers are spatially confined to less than three-dimensions, causing their energy levels to become quantized and their transport favorably affected. With recent progress in semiconductor growth and processing technologies low dimensionality has become practically realizable, this makes the study of contact properties to these systems increasingly important. In this work we study the contact between a low- dimensional semiconductor structure and a three- dimensional metal and the application of such a contact in photodetection. We theoretically derive the thermionic emission current for Schottky contact to two-dimensional and one-dimensional structures. The derivation underscores the discrete nature of low-dimensional structures and shows that the thermionic emission current is reduced by a factor exponentially proportional to the first quantized energy level. We also propose and formulate, for the first time, a physical phenomenon in two-dimensional structures created by modulation doping of a heterojunction, which is the effect of the cloud of electrons in the small bandgap material on the thermionic emission current. We have named this the electron- electron cloud effect; we show that this interaction increases the effective Schottky barrier height in a fashion counter to the image force lowering mechanism. In order to realize Schottky contact to low-dimensional structures, we have fabricated a novel Heterojunction Metal-Semiconductor-Metal (HMSM) photodetector. Experimental characterization and the general trends of the behavior of the HMSM devices are presented

  16. Doping concentration dependence of the photoluminescence spectra of n-type GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Arab, Shermin; Yao, Maoqing; Zhou, Chongwu; Daniel Dapkus, P.; Cronin, Stephen B.

    2016-05-01

    In this letter, the photoluminescence spectra of n-type doped GaAs nanowires, grown by the metal organic chemical vapor deposition method, are measured at 4 K and 77 K. Our measurements indicate that an increase in carrier concentration leads to an increase in the complexity of the doping mechanism, which we attribute to the formation of different recombination centers. At high carrier concentrations, we observe a blueshift of the effective band gap energies by up to 25 meV due to the Burstein-Moss shift. Based on the full width at half maximum (FWHM) of the photoluminescence peaks, we estimate the carrier concentrations for these nanowires, which varies from 6 × 1017 cm-3 (lightly doped), to 1.5 × 1018 cm-3 (moderately doped), to 3.5 × 1018 cm-3 (heavily doped) as the partial pressure of the disilane is varied from 0.01 sccm to 1 sccm during the growth process. We find that the growth temperature variation does not affect the radiative recombination mechanism; however, it does lead to a slight enhancement in the optical emission intensities. For GaAs nanowire arrays measured at room temperature, we observe the same general dependence of band gap, FWHM, and carrier concentration on doping.

  17. Design considerations for a GaAs nipi doping superlattice solar cell

    NASA Technical Reports Server (NTRS)

    Clark, Ralph; Goradia, Chandra; Brinker, David

    1987-01-01

    A new GaAs nipi doping superlattice solar cell structure is presented, which holds promise for high efficiency coupled with very high radiation tolerance. The structure has all contacts on the unilluminated side. Design constraints are presented which this structure must satisfy in order to exhibit high efficiency and high radiation tolerance. The results of self-consistent quantum mechanical calculations are presented which show that a viable design of this cell would include relatively thick n and p layers which are fairly heavily doped.

  18. p-type doping of GaAs nanowires using carbon

    NASA Astrophysics Data System (ADS)

    Salehzadeh, O.; Zhang, X.; Gates, B. D.; Kavanagh, K. L.; Watkins, S. P.

    2012-11-01

    We report on the electrical properties of Au-catalyzed C-doped GaAs nanowires (NWs) grown by metal organic vapor phase epitaxy. Transport measurements were carried out using a tungsten nanoprobe inside a scanning electron microscope by contacting to the Au catalyst particle of individual nanowires. The doping level could be varied from approximately (4 ± 1) × 1016 cm-3 to (1.0 ± 0.3) × 1019 cm-3 by varying the molar flow of the gas phase carbon precursor, as well as the group V to group III precursor ratio. It was found that the current transport mechanism switches from generation-recombination to tunnelling field emission by increasing the doping level to 1 × 1019 cm-3. Based on a diameter-dependent analysis of the apparent resistivity of the C-doped NWs, we propose that C incorporates into GaAs NWs through the triple boundary at the Au/NW interface. The p-type conductivity of the C-doped NWs was inferred by observing a rectification at negative bias (applied to the Au electrode) and confirmed by back-gating measurements performed on field effect transistor devices.

  19. OM-VPE growth of Mg-doped GaAs. [OrganoMetallic-Vapor Phase Epitaxy

    NASA Technical Reports Server (NTRS)

    Lewis, C. R.; Dietze, W. T.; Ludowise, M. J.

    1982-01-01

    The epitaxial growth of Mg-doped GaAs by the organometallic vapor phase epitaxial process (OM-VPE) has been achieved for the first time. The doping is controllable over a wide range of input fluxes of bis (cyclopentadienyl) magnesium, (C5H5)2Mg, the organometallic precursor to Mg.

  20. Carbon doping in molecular beam epitaxy of GaAs from a heated graphite filament

    NASA Technical Reports Server (NTRS)

    Malik, R. J.; Nottenberg, R. N.; Schubert, E. F.; Walker, J. F.; Ryan, R. W.

    1988-01-01

    Carbon doping of GaAs grown by molecular beam epitaxy has been obtained for the first time by use of a heated graphite filament. Controlled carbon acceptor concentrations over the range of 10 to the 17th-10 to the 20th/cu cm were achieved by resistively heating a graphite filament with a direct current power supply. Capacitance-voltage, p/n junction and secondary-ion mass spectrometry measurements indicate that there is negligible diffusion of carbon during growth and with postgrowth rapid thermal annealing. Carbon was used for p-type doping in the base of Npn AlGaAs/GaAs heterojunction bipolar transistors. Current gains greater than 100 and near-ideal emitter heterojunctions were obtained in transistors with a carbon base doping of 1 x 10 to the 19th/cu cm. These preliminary results indicate that carbon doping from a solid graphite source may be an attractive substitute for beryllium, which is known to have a relatively high diffusion coefficient in GaAs.

  1. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

    SciTech Connect

    MAR,ALAN; LOUBRIEL,GUILLERMO M.; ZUTAVERN,FRED J.; O'MALLEY,MARTIN W.; HELGESON,WESLEY D.; BROWN,DARWIN JAMES; HJALMARSON,HAROLD P.; BACA,ALBERT G.; THORNTON,R.L.; DONALDSON,R.D.

    1999-12-17

    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 100 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer that is very effective in the suppression of filament formation, alleviating current crowding. Damage-free operation is now possible with virtually infinite expected lifetime at much higher current levels than before. The inherent damage-free current capacity of the bulk GaAs itself depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approx}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs, unlike a switch with conventional contacts. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

  2. The influence of high-energy electrons irradiation on the electrical properties of Schottky barrier detectors based on semi-insulating GaAs

    NASA Astrophysics Data System (ADS)

    Zatko, B.; Sagatova, A.; Bohacek, P.; Sedlackova, K.; Sekacová, M.; Arbet, J.; Necas, V.

    2016-01-01

    In this work we fabricated detectors based on semi-insulating GaAs and studied their electrical properties (current-voltage characteristics, galvanomagnetic measurements) after irradiation with 5 MeV electrons from a linear accelerator up to a dose of 104 kGy. A series of detectors were prepared using Ti/Pt/Au Schottky contact with 1 mm diameter. The thickness of the base material was about 230 μm. A whole area Ni/AuGe/Au ohmic contact was evaporated on the back side. For galvanomagnetic measurements we used three samples from the same wafer. All samples were irradiated by a pulse beam of 5 MeV electrons using the linear accelerator in 11 steps, where the accumulative dose increased from 1 kGy up to 104 kGy. Also different dose rates (20, 40 and 80 kGy/h) were applied to the samples. After each irradiation step we performed electrical measurement of each sample. We analyze the electron Hall mobility, resistivity, electron Hall concentration, breakdown voltage and reverse current of samples before and after irradiation using different dose rates.

  3. Determination of doping effects on Si and GaAs bulk samples properties by photothermal investigations

    NASA Astrophysics Data System (ADS)

    Abroug, Sameh; Saadallah, Faycel; Yacoubi, Noureddine

    2007-11-01

    The knowledge of doping effects on optical and thermal properties of semiconductors is crucial for the development of opto-electronic compounds. The purpose of this work is to investigate these effects by mirage effect technique and spectroscopic ellipsometry SE. The near gap optical spectra are obtained from photothermal signal for differently doped Si and GaAs bulk samples. However, the above bandgap absorption is determined from SE. These spectra show that absorption in the near IR increases with dopant density and also the bandgap shifts toward low energies. This behavior is due to free carrier absorption which could be obtained by subtracting phonon-assisted absorption from the measured spectrum. This carrier absorption is related to the dopant density through a semi-empirical model. We have also used the photothermal signal phase to measure the influence of doping on thermal diffusivity.

  4. Photoluminescence analysis of p-doped GaAs using the Roosbroeck Shockley relation

    NASA Astrophysics Data System (ADS)

    Ullrich, B.; Munshi, S. R.; Brown, G. J.

    2007-10-01

    Linking absorption with emission, the Roosbroeck-Shockley relation (RSR) expresses a fundamental principle of semiconductor optics. Despite its elementary character, the RSR is hardly advocated since it is commonly understood that the relation holds for intrinsic materials only. However, we demonstrate that the RSR reproduces very well the photoluminescence of p-doped GaAs over the temperature range of 5-300 K. The fitting parameters used, such as energy position and doping-induced band gap shrinkage, satisfactorily coincide with the literature. The presented results show that the RSR can have a much broader impact in semiconductor analysis than generally presumed. The paper is dedicated to our friend and mentor Rand R Biggers (1946-2006)

  5. Photoluminescence lineshape features of carbon δ-doped GaAs heterostructures.

    PubMed

    Schuster, J; Kim, T Y; Batke, E; Reuter, D; Wieck, A D

    2012-04-25

    Photoluminescence lineshape properties of quasi-two-dimensional electron systems in setback δ-doped GaAs heterostructures are studied at liquid helium temperature. Contributions from the ground and the first excited two-dimensional subband are clearly observed. A simple fit to the lineshape including broadening demonstrates that there is an exponential low-energy tail associated with the ground subband. No such tail is observed for the first excited subband. The fit precisely reveals the subband bottom energies, the Fermi energy, the electron temperature and the recombination intensities. A self-consistent calculation of subband properties including the potential contribution of the setback δ-doping reproduces well the subband properties and the recombination intensities. PMID:22446024

  6. The current–voltage and capacitance–voltage characteristics at high temperatures of Au Schottky contact to n-type GaAs

    SciTech Connect

    Özerli, Halil; Karteri, İbrahim; Karataş, Şükrü; Altindal, Şemsettin

    2014-05-01

    Highlights: • The electronic parameters of the diode under temperature were investigated. • The barrier heights have a Gaussian distribution. • Au/n-GaAs diode exhibits a rectification behavior. - Abstract: We have investigated the temperature-dependent current–voltage (I–V) and capacitance–voltage (C–V) characteristics of Au/n-GaAs Schottky barrier diodes (SBDs) in the temperature range of 280–415 K. The barrier height for the Au/n-type GaAs SBDs from the I–V and C–V characteristics have varied from 0.901 eV to 0.963 eV (I–V) and 1.234 eV to 0.967 eV (C–V), and the ideality factor (n) from 1.45 to 1.69 in the temperature range 280–415 K. The conventional Richardson plots are found to be linear in the temperature range measured. Both the ln(I{sub 0}/T{sup 2}) versus (kT){sup −1} and ln(I{sub 0}/T{sup 2}) versus (nkT){sup −1} plots gives a straight line corresponding to activation energies 0.773 eV and 0.870 eV, respectively. A Φ{sub b0} versus 1/T plot was drawn to obtain evidence of a Gaussian distribution of the BHs, and values of Φ{sup ¯}{sub b0} = 1.071 eV and σ{sub 0} = 0.094 V for the mean BH and zero-bias standard deviation have been obtained from this plot.

  7. Magnetron Sputtered Gold Contacts on N-gaas

    NASA Technical Reports Server (NTRS)

    Buonaquisti, A. D.; Matson, R. J.; Russell, P. E.; Holloway, P. H.

    1984-01-01

    Direct current planar magnetron sputtering was used to deposit gold Schottky barrier electrical contacts on n-type GaAs of varying doping densities. The electrical character of the contact was determined from current voltage and electron beam induced voltage data. Without reducing the surface concentration of carbon and oxide, the contacts were found to be rectifying. There is evidence that energetic neutral particles reflected from the magnetron target strike the GaAs and cause interfacial damage similar to that observed for ion sputtering. Particle irradiation of the surface during contact deposition is discussed.

  8. Current-voltage characteristics of silicon-doped GaAs nanowhiskers with a protecting AlGaAs coating overgrown with an undoped GaAs layer

    SciTech Connect

    Dementyev, P. A.; Dunaevskii, M. S. Samsonenko, Yu. B.; Cirlin, G. E.; Titkov, A. N.

    2010-05-15

    A technique for measurement of longitudinal current-voltage characteristics of semiconductor nanowhiskers remaining in contact with the growth surface is suggested. The technique is based on setting up a stable conductive contact between the top of a nanowhisker and the probe of an atomic-force microscope. It is demonstrated that, as the force pressing the probe against the top of the nanowhisker increases, the natural oxide layer covering the top is punctured and a direct contact between the probe and the nanowhisker body is established. In order to prevent nanowhiskers from bending and, ultimately, breaking, they need to be somehow fixed in space. In this study, GaAs nanowhiskers were kept fixed by partially overgrowing them with a GaAs layer. To isolate nanowhiskers from the matrix they were embedded in, they were coated by a nanometer layer of AlGaAs. Doping of GaAs nanowhiskers with silicon was investigated. The shape of the current-voltage characteristics obtained indicates that introduction of silicon leads to p-type conduction in nanowhiskers, in contrast to n-type conduction in bulk GaAs crystals grown by molecular-beam epitaxy. This difference is attributed to the fact that the vapor-liquid-solid process used to obtain nanowhiskers includes a final stage of liquid-phase epitaxy, a characteristic of the latter being p-type conduction obtained in bulk GaAs(Si) crystals.

  9. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

    SciTech Connect

    Baca, A.G.; Brown, D.J.; Donaldson, R.D.; Helgeson, W.D.; Hjalmarson, H.P.; Loubriel, G.M.; Mar, A.; O'Malley, M.W.; Thornton, R.L.; Zutavern, F.J.

    1999-08-05

    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 50 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer beneath the PCSS contacts which is very effective in the suppression of filament formation and alleviating current crowding to improve the longevity of PCSS. Virtually indefinite, damage-free operation is now possible at much higher current levels than before. The inherent damage-free current capacity of the switch depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approximately}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

  10. Large anomalous Hall resistance of pair {delta}-doped GaAs structures grown by molecular-beam epitaxy

    SciTech Connect

    Jung, D. W.; Noh, J. P.; Touhidul Islam, A. Z. M.; Otsuka, N.

    2008-02-15

    Beryllium/silicon pair {delta}-doped GaAs structures grown by molecular-beam epitaxy exhibit a Hall resistance which has a nonlinear dependence on the applied magnetic field and which is strongly correlated to the negative magnetoresistance observed under the applied magnetic field parallel to the {delta}-doped layers. Dependence of the occurrence of the nonlinear Hall resistance on the growth condition is investigated. A significantly large increase in both the magnitude and the nonlinearity of the Hall resistance is observed from samples whose GaAs buffer layers are grown under the condition of a low As/Ga flux ratio. Reflection high energy electron diffraction and electron microscope observations show that a faceted surface develops with the growth and postgrowth annealing of a GaAs buffer layer under the condition of a low As flux. From samples which have only Si {delta}-doped layers and exhibit the n-type conduction, such nonlinear Hall resistance is not observed. The nonlinearity of the Hall resistance of Be/Si pair {delta}-doped structures depends on the single parameter B/T, where B and T are the applied magnetic field and the temperature, respectively. Based on these results, it is suggested that the nonlinear Hall resistance of Be/Si pair {delta}-doped structures is the anomalous Hall effect caused by localized spins in {delta}-doped layers.

  11. Depth uniformity of electrical properties and doping limitation in neutron-transmutation-doped semi-insulating GaAs

    SciTech Connect

    Satoh, M.; Kuriyama, K. ); Kawakubo, T. )

    1990-04-01

    Depth uniformity of electrical properties has been evaluated for neutron-transmutation-doped (NTD), semi-insulating GaAs irradiated with thermal neutrons of 1.5{times}10{sup 18} cm{sup {minus}2} by the van der Pauw method combined with iterative etching of the surface. In NTD-GaAs wafers (thickness {similar to}410 {mu}m) annealed for 30 min at 700 {degree}C, the depth profiles of the resistivity, the carrier concentration, and the Hall mobility show constant values of 1{times}10{sup {minus}2} {Omega} cm, 2.0{times}10{sup 17} cm{sup {minus}3}, and 3100 cm{sup 2}/V s, respectively, within an experimental error of 5%. In an annealing process, the redistribution and/or the segregation of NTD impurities is not observed. We also discuss the limitations of low-level NTD in semi-insulating GaAs. It is suggested that the activation of the NTD-impurities below {similar to}1{times}10{sup 16} cm{sup {minus}3} is mainly restricted by the presence of the midgap electron trap (EL2).

  12. Electrical spin injection in modulation-doped GaAs from an in situ grown Fe/MgO layer

    SciTech Connect

    Shim, Seong Hoon; Kim, Hyung-jun; Koo, Hyun Cheol; Lee, Yun-Hi; Chang, Joonyeon

    2015-09-07

    We study spin accumulation in n-doped GaAs that were electrically injected from Fe via MgO using three-terminal Hanle measurement. The Fe/MgO/GaAs structures were prepared in a cluster molecular beam epitaxy that did not require the breaking of the vacuum. We found the crystal orientation relationship of epitaxial structures Fe[100]//MgO[110]//GaAs[110] without evident defects at the interface. Control of depletion width and interface resistance by means of modulation doping improves spin injection, leading to enhanced spin voltage (ΔV) of 6.3 mV at 10 K and 0.8 mV even at 400 K. The extracted spin lifetime and spin diffusion length of GaAs are 220 ps and 0.77 μm, respectively, at 200 K. MgO tunnel barrier grown in situ with modulation doping at the interface appears to be promising for spin injection into GaAs.

  13. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R.; Davis, Jeffrey A.; Wang, Yuda; Smith, Leigh M.; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati

    2016-06-01

    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications.

  14. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires

    PubMed Central

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R.; Davis, Jeffrey A.; Wang, Yuda; Smith, Leigh M.; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati

    2016-01-01

    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications. PMID:27311597

  15. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires.

    PubMed

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R; Davis, Jeffrey A; Wang, Yuda; Smith, Leigh M; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati

    2016-01-01

    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications. PMID:27311597

  16. Experimental and numerical investigation of contact-area-limited doping for top-contact pentacene thin-film transistors with Schottky contact.

    PubMed

    Noda, Kei; Wada, Yasuo; Toyabe, Toru

    2015-10-28

    Effects of contact-area-limited doping for pentacene thin-film transistors with a bottom-gate, top-contact configuration were investigated. The increase in the drain current and the effective field-effect mobility was achieved by preparing hole-doped layers underneath the gold contact electrodes by coevaporation of pentacene and 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F4TCNQ), confirmed by using a thin-film organic transistor advanced simulator (TOTAS) incorporating Schottky contact with a thermionic field emission (TFE) model. Although the simulated electrical characteristics fit the experimental results well only in the linear regime of the transistor operation, the barrier height for hole injection and the gate-voltage-dependent hole mobility in the pentacene transistors were evaluated with the aid of the device simulation. This experimental data analysis with the simulation indicates that the highly-doped semiconducting layers prepared in the contact regions can enhance the charge carrier injection into the active semiconductor layer and concurrent trap filling in the transistor channel, caused by the mitigation of a Schottky energy barrier. This study suggests that both the contact-area-limited doping and the device simulation dealing with Schottky contact are indispensable in designing and developing high-performance organic thin-film transistors. PMID:24922359

  17. Enhanced efficiency of graphene-silicon Schottky junction solar cells by doping with Au nanoparticles

    SciTech Connect

    Liu, X.; Zhang, X. W. Yin, Z. G.; Meng, J. H.; Gao, H. L.; Zhang, L. Q.; Zhao, Y. J.; Wang, H. L.

    2014-11-03

    We have reported a method to enhance the performance of graphene-Si (Gr/Si) Schottky junction solar cells by introducing Au nanoparticles (NPs) onto the monolayer graphene and few-layer graphene. The electron transfer between Au NPs and graphene leads to the increased work function and enhanced electrical conductivity of graphene, resulting in a remarkable improvement of device efficiency. By optimizing the initial thickness of Au layers, the power conversion efficiency of Gr/Si solar cells can be increased by more than three times, with a maximum value of 7.34%. These results show a route for fabricating efficient and stable Gr/Si solar cells.

  18. High-Performance GaAs Nanowire Solar Cells for Flexible and Transparent Photovoltaics.

    PubMed

    Han, Ning; Yang, Zai-xing; Wang, Fengyun; Dong, Guofa; Yip, SenPo; Liang, Xiaoguang; Hung, Tak Fu; Chen, Yunfa; Ho, Johnny C

    2015-09-16

    Among many available photovoltaic technologies at present, gallium arsenide (GaAs) is one of the recognized leaders for performance and reliability; however, it is still a great challenge to achieve cost-effective GaAs solar cells for smart systems such as transparent and flexible photovoltaics. In this study, highly crystalline long GaAs nanowires (NWs) with minimal crystal defects are synthesized economically by chemical vapor deposition and configured into novel Schottky photovoltaic structures by simply using asymmetric Au-Al contacts. Without any doping profiles such as p-n junction and complicated coaxial junction structures, the single NW Schottky device shows a record high apparent energy conversion efficiency of 16% under air mass 1.5 global illumination by normalizing to the projection area of the NW. The corresponding photovoltaic output can be further enhanced by connecting individual cells in series and in parallel as well as by fabricating NW array solar cells via contact printing showing an overall efficiency of 1.6%. Importantly, these Schottky cells can be easily integrated on the glass and plastic substrates for transparent and flexible photovoltaics, which explicitly demonstrate the outstanding versatility and promising perspective of these GaAs NW Schottky photovoltaics for next-generation smart solar energy harvesting devices. PMID:26284305

  19. High-field magnetoluminescence studies of Mn-doped GaAs epilayers

    NASA Astrophysics Data System (ADS)

    Meining, C. J.; Ruester, C.; Mallory, R.; Itskos, G.; Cheon, M.; Chen, X.; Wang, S.; Luo, H.; Petrou, A.; McCombe, B. D.; Wei, X.; Liu, X.; Sasaki, Y.; Furdyna, J. K.; Palczewska, M.

    2002-03-01

    We have carried out magnetoluminescence and magntotransport studies of three MBE grown GaAs epilayers. The samples were grown at a substrate temperature of 590^circC and randomly doped with manganese acceptors at different concentrations. The lowest density sample shows activated p-type resistivity, whereas the highly doped samples exhibit n-type metallic behavior. The latter result will be discussed in terms of MnAs precipitates as observed in TEM studies. The degree of circular polarization P of the conduction band to Mn-acceptor transition (CB arrow A(Mn)) was determined for magnetic fields up to 32 T at the NHMFL. In the lowest Mn concentration sample, P increases with magnetic field and saturates around 15 T. In the other two samples, P exhibits a step at about 22 T. These results will be discussed in terms of level crossing of the antiferromagnetically coupled neutral Mn acceptor pairs. >From this analysis we obtain a Mn-Mn coupling constant J of approximately 10 K. Work supported in part by DARPA/ONR N00014-00-1-0951

  20. X-band MMIC amplifier with pulse-doped GaAs MESFET's

    NASA Astrophysics Data System (ADS)

    Shiga, Nobuo; Nakajima, Shigeru; Otobe, Kenji; Sekiguchi, Takeshi; Kuwata, Nobuhiro; Matsuzaki, Ken-Ichiro; Hayashi, Hideki

    1991-12-01

    The design and test of an X-band monolithic four-stage low noise amplifier (LNA) with 0.5 micron-gate pulse-doped GaAs MESFETs for application in a direct broadcast satellite (DBS) converter is presented. The key feature of the research is a detailed demonstration of the advantages of using series feedback with experiments and simulations. This LNA shows an excellent input VSWR match under 1.4 as well as a noise figure of 1.67 dB and a gain of 24 dB at 12 GHz. The noise figure, the gain and VSWRs exhibit very little bias current dependence due to the exceptional features of the pulse-doped structure FETs and the optimized circuit design. Insensitivity to bias current implies performance stability in the face of process fluctuations. Thus, the yield of chips with noise figures of less than 2.0 dB is as high as 62.5 percent, and the variations of gain and VSWR are highly uniform as well.

  1. Mg-doping transients during metalorganic vapor phase epitaxy of GaAs and AlGaInP

    NASA Astrophysics Data System (ADS)

    Kondo, Makoto; Anayama, Chikashi; Sekiguchi, Hiroshi; Tanahashi, Toshiyuki

    1994-08-01

    We studied magnesium-doping transients during metalorganic vapor phase epitaxy of GaAs and (Al(x)Ga(1-x))(0.5)In(0.5)P (0 less than or = x less than or = 0.7). We examined the transient of Mg concentration depth profile through epitaxial layers when Mg precursors are initially injected into the reactor (doping delay). We found that increasing the Al composition of epitaxial layers, i.e., increasing the mole fraction of Al precursors in the reactor, significantly reduces the Mg-doping delay. We obtained this result for both trimethylaluminum (TMAl) and triethylaluminum (TEAl). We quantitatively modeled this phenomenon based on the competitive adsorption of Mg and Al precursors on the internal surface of the reactor. Our model also explains that the Mg concentration in epitaxial layers increases either linearly or superlinearly with the Mg precursor input, depending on the length of the doping delay.

  2. Effect of thin emitter set-back layer on GaAs delta-doped emitter bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Lew, K. L.; Yoon, S. F.

    2005-05-01

    GaAs delta-doped emitter bipolar junction transistors (δ-BJT) with different emitter set-back layer thicknesses of 10to50nm were fabricated to study the emitter set-back layer thickness effect on device dc performance. We found that the current gain decreases following decrease in the emitter set-back layer thickness. A detailed analysis was performed to explain this phenomenon, which is believed to be caused by reduction of the effective barrier height in the δ-BJT. This is due to change in the electric-field distribution in the delta-doped structure caused by the built-in potential of the base-emitter (B-E ) junction. Considering the recombination and barrier height reduction effects, the thickness of the emitter set-back layer should be designed according to the B-E junction depletion width with a tolerance of ±5nm. The dc performance of a δ-BJT designed based on this criteria is compared to that of a Al0.25Ga0.75As /GaAs heterojunction bipolar transistor (HBT). Both devices employed base doping of 2×1019cm-3 and base-to-emitter doping ratio of 40. Large emitter area (AE≈1.6×10-5cm-2) and small emitter area (AE≈1.35×10-6cm-2) device current gains of 40 and 20, respectively, were obtained in both types of transistors passivated by (NH4)2S treatment. The measured current gain of the GaAs δ-BJT is the highest reported for a homojunction device with such high base-to-emitter doping ratio normally used in HBT devices.

  3. Nano-structure fabrication of GaAs using AFM tip-induced local oxidation method: different doping types and plane orientations

    PubMed Central

    2011-01-01

    In this study, we have fabricated nano-scaled oxide structures on GaAs substrates that are doped in different conductivity types of p- and n-types and plane orientations of GaAs(100) and GaAs(711), respectively, using an atomic force microscopy (AFM) tip-induced local oxidation method. The AFM-induced GaAs oxide patterns were obtained by varying applied bias from approximately 5 V to approximately 15 V and the tip loading forces from 60 to 180 nN. During the local oxidation, the humidity and the tip scan speed are fixed to approximately 45% and approximately 6.3 μm/s, respectively. The local oxidation rate is further improved in p-type GaAs compared to n-type GaAs substrates whereas the rate is enhanced in GaAs(100) compared to and GaAs(711), respectively, under the identical conditions. In addition, the oxide formation mechanisms in different doping types and plane orientations were investigated and compared with two-dimensional simulation results. PMID:21978373

  4. Observations of exciton and carrier spin relaxation in Be doped p-type GaAs

    SciTech Connect

    Asaka, Naohiro; Harasawa, Ryo; Tackeuchi, Atsushi; Lu, Shulong; Dai, Pan

    2014-03-17

    We have investigated the exciton and carrier spin relaxation in Be-doped p-type GaAs. Time-resolved spin-dependent photoluminescence (PL) measurements revealed spin relaxation behaviors between 10 and 100 K. Two PL peaks were observed at 1.511 eV (peak 1) and 1.497 eV (peak 2) at 10 K, and are attributed to the recombination of excitons bound to neutral Be acceptors (peak 1) and the band-to-acceptor transition (peak 2). The spin relaxation times of both PL peaks were measured to be 1.3–3.1 ns at 10–100 K, and found to originate from common electron spin relaxation. The observed existence of a carrier density dependence of the spin relaxation time at 10–77 K indicates that the Bir-Aronov-Pikus process is the dominant spin relaxation mechanism.

  5. Schottky barrier solar cell

    SciTech Connect

    Cohen, M.J.; Harris, J.S.

    1980-10-14

    A solar cell is constructed by coating an n-type conductivity semiconductor with a thin layer of bromine doped, polymeric sulfur-nitride, (SnBr/sub 0/ /sub 4/)/sub x/. Metal deposits are provided on both materials for making electrical contact to the cell. In a preferred embodiment, the semiconductor is silicon. In a second preferred embodiment, the semiconductor is GaAs on an n+-type conductivity GaAs substrate.

  6. Enhancement of intensity-dependent absorption in InP and GaAs at 1.9 microns by doping

    NASA Technical Reports Server (NTRS)

    Li, N.-L.; Bass, M.; Swimm, R.

    1985-01-01

    It is pointed out that the study of intensity-dependent absorption (IDA) in general, and two-photon absorption (TPA), in particular, has suffered from experimental difficulties and inadequate theoretical models. Bass et al. (1979) could improve the experimental situation by making use of laser calorimetry to obtain directly the TPA coefficient of a medium with a high degree of sensitivity. In the present investigation, the employed technique has been used to study the effect of deep level dopants on IDA in InP and GaAs. It is found that the coefficient for IDA is strongly dependent on the presence of Fe in InP and Cr in GaAs. The conducted investigation had the objective to examine the effect of deep level impurities on IDA processes in InP and GaAs. Fe-doped InP and Cr-doped GaAs were compared with undoped crystals.

  7. Self-consistent calculations and design considerations for a GaAs nipi doping superlattice solar cell

    NASA Technical Reports Server (NTRS)

    Clark, Ralph O.; Goradia, Chandra; Brinker, David

    1987-01-01

    The authors present design constraints which show that a previously proposed GaAs nipi doping superlattice solar cell structure would not work as an efficient space solar cell. A structure based on the CLEFT process, which shows promise of being an efficient cell with very high radiation tolerance, is proposed. In order to test theoretically its viability and to optimize its design, self-consistent quantum mechanical calculations were made for a number of thicknesses of the n, i, and p layers and the dopings in the n and p layers. These results show that: 1) an i layer is not necessary; in fact, its presence makes it difficult to satisfy one of the key constraints; 2) a near-optimum design with 750-A thick n and p layers with dopings of 2.5E18/cu cm and a selective contact separation of 20 microns would yield both high efficiency and very high radiation tolerance.

  8. Surface passivation of tellurium-doped GaAs nanowires by GaP: Effect on electrical conduction

    SciTech Connect

    Darbandi, A.; Salehzadeh, O.; Watkins, S. P.; Kuyanov, P.; LaPierre, R. R.

    2014-06-21

    We report on the surface passivation of Au-assisted Te-doped GaAs nanowires (NWs) grown by metalorganic vapor phase epitaxy. The electrical properties of individual free standing NWs were assessed using a tungsten nano-probe inside a scanning electron microscope. The diameter independent apparent resistivity of both strained and relaxed passivated NWs suggests the unpinning of the Fermi level and reduction of sidewalls surface states density. Similar current-voltage properties were observed for partially axially relaxed GaAs/GaP NWs. This indicates a negligible contribution of misfit dislocations in the charge transport properties of the NWs. Low temperature micro-photoluminescence (μ-PL) measurements were also carried out for both uncapped and passivated GaAs NWs. The improvement of the integrated (μ-PL) intensity for GaAs/GaP NWs further confirms the effect of passivation.

  9. Radiation tolerant GaAs MESFET with a highly-doped thin active layer grown by OMVPE

    SciTech Connect

    Nishiguchi, M.; Hashinaga, T.; Nishizawa, H.; Hayashi, H. ); Okazaki, N. ); Kitagawa, M.; Fujino, T. )

    1990-12-01

    A new structure of GaAs MESFET with high radiation tolerance is proposed. Changes in electrical parameters of a GaAs MESFET as a function of total {gamma}-ray dose have been found to be caused mainly by a decrease in the effective carrier concentration in an active layer. The authors have designed a new structure from a simulation based on an empirical relationship between the changes of the effective carrier concentration and the total {gamma}-ray dose. It has been successfully demonstrated by utilizing a highly-doped thin active layer (4 {times} 10{sup 18} cm{sup {minus}3}, 100 {Angstrom}) grown by OMVPE. This MESFET can withstand a dose ten times higher (1 {times} 10{sup 9} rads(GaAs)) than a conventional one can.

  10. Electronic structures and magnetic stabilities of 2D Mn-doped GaAs nanosheets: The role of long-range exchange interactions and doping strategies

    SciTech Connect

    Lan, Mu; Xiang, Gang Zhang, Xi

    2014-08-28

    We investigate the structural, electronic and magnetic properties of Mn atoms doped two-dimensional (2D) hexagonal GaAs nanosheets (GaAsNSs) using both first-principle calculations and Monte Carlo simulations. The first-principle molecular dynamics is first used to test the structural stability of Mn-doped GaAsNS ((Ga,Mn)AsNS). The analysis of spin-resolved electronic structures and determination of magnetic exchange interactions based on density functional theory (DFT) calculations reveals the existence of long-range exchange interaction in the system. Finally, Metropolis Monte Carlo simulation is employed to estimate Curie temperatures (T{sub C}s) of (Ga,Mn)AsNSs with different doping concentrations by different doping strategies. The results indicate that a T{sub C} up to 82 K can be obtained in regularly-doped (Ga,Mn)AsNSs and doping strategies have prominent impact on T{sub C}s of the systems, which emphasizes the importance of both long-range interactions and doping strategies in reduced dimensional diluted magnetic semiconductors (DMSs)

  11. Roles of lightly doped carbon in the drift layers of vertical n-GaN Schottky diode structures on freestanding GaN substrates

    NASA Astrophysics Data System (ADS)

    Tanaka, Takeshi; Kaneda, Naoki; Mishima, Tomoyoshi; Kihara, Yuhei; Aoki, Toshichika; Shiojima, Kenji

    2015-04-01

    We studied the roles of lightly doped carbon in a series of n-GaN Schottky diode epitaxial structures on freestanding GaN substrates, and evaluated the effects of the doping on diode performances. A large variation of compensation ratio was observed for carbon doping at (1-2) × 1016 cm-3. A model was proposed to explain this phenomenon, in which a vulnerable balance between donor-type CGa and deep acceptor CN strongly affected the free-carrier generation. Application of Norde plots and reverse biased leakage current in current-voltage measurements suggested provisional optimization for a free-carrier concentration of 8 × 1015 cm-3 to achieve a tradeoff between breakdown voltage and on-resistance of the n-GaN diodes.

  12. Emission-wavelength tuning of InAs quantum dots grown on nitrogen-δ-doped GaAs(001)

    NASA Astrophysics Data System (ADS)

    Kaizu, Toshiyuki; Taguchi, Kohei; Kita, Takashi

    2016-05-01

    We studied the structural and photoluminescence (PL) characteristics of InAs quantum dots (QDs) grown on nitrogen (N) δ-doped GaAs(001). The emission wavelength for low-density N-δ doping exhibited a blueshift with respect to that for undoped GaAs and was redshifted with increasing N-sheet density. This behavior corresponded to the variation in the In composition of the QDs. N-δ doping has two opposite and competing effects on the incorporation of Ga atoms from the underlying layer into the QDs during the QD growth. One is the enhancement of Ga incorporation induced by the lattice strain, which is due to the smaller radius of N atoms. The other is an effect blocking for Ga incorporation, which is due to the large bonding energy of Ga-N or In-N. At a low N-sheet density, the lattice-strain effect was dominant, while the blocking effect became larger with increasing N-sheet density. Therefore, the incorporation of Ga from the underlying layer depended on the N-sheet density. Since the In-Ga intermixing between the QDs and the GaAs cap layer during capping also depended on the size of the as-grown QDs, which was affected by the N-sheet density, the superposition of these three factors determined the composition of the QDs. In addition, the piezoelectric effect, which was induced with increased accumulation of lattice strain and the associated high In composition, also affected the PL properties of the QDs. As a result, tuning of the emission wavelength from 1.12 to 1.26 μm was achieved at room temperature.

  13. The contact and photoconductivity characteristics between Co doped amorphous carbon and GaAs: n-type low-resistivity and semi-insulated high-resistivity GaAs

    NASA Astrophysics Data System (ADS)

    Zhai, Zhangyin; Yu, Hualing; Zuo, Fen; Guo, Chunlian; Chen, Guibin; Zhang, Fengming; Wu, Xiaoshan; Gao, Ju

    2016-06-01

    The Co doped amorphous carbon films (a-C:Co), deposited by pulsed laser deposition, show p-n and ohmic contact characteristics with n-type low resistivity GaAs (L-GaAs) and semi-insulated high-resistivity GaAs (S-GaAs). The photosensitivity enhances for a-C:Co/L-GaAs, while inverse decreases for a-C:Co/S-GaAs heterojunction, respectively. Furthermore, the enhanced photosensitivity for the a-C:Co/L-GaAs/Ag heterojunction also shows deposition temperature dependence behavior, and the optimum deposition temperature is around 500 °C.

  14. Photoluminescence study on heavily donor and acceptor impurity doped GaAs layers grown by molecular-beam epitaxy

    SciTech Connect

    Islam, A. Z. M. Touhidul; Jung, D. W.; Noh, J. P.; Otsuka, N.

    2009-05-01

    Gallium arsenide layers doped with high concentrations of Be and Si by molecular-beam epitaxy are studied by photoluminescence (PL) spectroscopy. PL peaks from doped layers are observed at energies significantly lower than the band-gap of GaAs. The growth and doping conditions suggest that the origin of these peaks is different from that of low energy PL peaks, which were observed in earlier studies and attributed to impurity-vacancy complexes. The dependence of the peak energy on the temperature and the annealing is found to differ from that of the peaks attributed to impurity-vacancy complexes. On the basis of these observations, it is suggested that the low energy peaks are attributed to short range ordered arrangements of impurity ions. This possibility is examined by calculations of the PL spectra with models of pairs of acceptor and donor delta-doped layers and PL experiments of a superlattice of pairs of Be and Si delta-doped layers.

  15. Optical tunability of magnetic polaron stability in single-Mn doped bulk GaAs and GaAs/AlGaAs quantum dots

    NASA Astrophysics Data System (ADS)

    Qu, Fanyao; Moura, Fábio Vieira; Alves, Fabrizio M.; Gargano, Ricardo

    2013-03-01

    Optical control of magnetic property of a magnetic polaron (MP) in Mn-doped bulk GaAs and GaAs/AlGaAs quantum dots (QDs) have been studied. We have developed basis optimization technique for the method of linear combination of atomic orbitals (LCAOs), which significantly improve the accuracy of the conventional LCAO calculation. We have demonstrated that a monochromatic, linearly polarized, intense pulsed laser field induces a collapse of the MP and an ionization of Mn-acceptor in Mn-doped GaAs materials due to a dichotomy of hole wave function. We find this optical tunability of MP stability can be adjusted by confinement introduced in GaAs QDs.

  16. Photoreflectance and surface photovoltage spectroscopy of beryllium-doped GaAs /AlAs multiple quantum wells

    NASA Astrophysics Data System (ADS)

    Čechavičius, B.; Kavaliauskas, J.; Krivaitė, G.; Seliuta, D.; Valušis, G.; Halsall, M. P.; Steer, M. J.; Harrison, P.

    2005-07-01

    We present an optical study of beryllium δ-doped GaAs /AlAs multiple quantum well (QW) structures designed for sensing terahertz (THz) radiation. Photoreflectance (PR), surface photovoltage (SPV), and wavelength-modulated differential surface photovoltage (DSPV) spectra were measured in the structures with QW widths ranging from 3to20nm and doping densities from 2×1010to5×1012cm-2 at room temperature. The PR spectra displayed Franz-Keldysh oscillations which enabled an estimation of the electric-field strength of ˜20kV/cm at the sample surface. By analyzing the SPV spectra we have determined that a buried interface rather than the sample surface mainly governs the SPV effect. The DSPV spectra revealed sharp features associated with excitonic interband transitions which energies were found to be in a good agreement with those calculated including the nonparabolicity of the energy bands. The dependence of the exciton linewidth broadening on the well width and the quantum index has shown that an average half monolayer well width fluctuations is mostly predominant broadening mechanism for QWs thinner than 10nm. The line broadening in lightly doped QWs, thicker than 10nm, was found to arise from thermal broadening with the contribution from Stark broadening due to random electric fields of the ionized impurities in the structures. We finally consider the possible influence of strong internal electric fields, QW imperfections, and doping level on the operation of THz sensors fabricated using the studied structures.

  17. GaInP/GaAs tandem solar cells with highly Te- and Mg-doped GaAs tunnel junctions grown by MBE

    NASA Astrophysics Data System (ADS)

    Zheng, Xin-He; Liu, San-Jie; Xia, Yu; Gan, Xing-Yuan; Wang, Hai-Xiao; Wang, Nai-Ming; Yang, Hui

    2015-10-01

    We report a GaInP/GaAs tandem solar cell with a novel GaAs tunnel junction (TJ) with using tellurium (Te) and magnesium (Mg) as n- and p-type dopants via dual-filament low temperature effusion cells grown by molecular beam epitaxy (MBE) at low temperature. The test Te/Mg-doped GaAs TJ shows a peak current density of 21 A/cm2. The tandem solar cell by the Te/Mg TJ shows a short-circuit current density of 12 mA/cm2, but a low open-circuit voltage range of 1.4 V˜1.71 V under AM1.5 illumination. The secondary ion mass spectroscopy (SIMS) analysis reveals that the Te doping is unexpectedly high and its doping profile extends to the Mg doping region, thus possibly resulting in a less abrupt junction with no tunneling carriers effectively. Furthermore, the tunneling interface shifts from the intended GaAs n++/p++ junction to the AlGaInP/GaAs junction with a higher bandgap AlGaInP tunneling layers, thereby reducing the tunneling peak. The Te concentration of ˜ 2.5 × 1020 in GaAs could cause a lattice strain of 10-3 in magnitude and thus a surface roughening, which also negatively influences the subsequent growth of the top subcell and the GaAs contacting layers. The doping features of Te and Mg are discussed to understand the photovoltaic response of the studied tandem cell. Project supported by the SINANO-SONY Joint Program (Grant No. Y1AAQ11001), the National Natural Science Foundation of China (Grant No. 61274134), the USCB Start-up Program (Grant No. 06105033), and the International Cooperation Projects of Suzhou City, China (Grant No. SH201215).

  18. Doping and electronic properties of GaAs grown by close-spaced vapor transport from powder sources for scalable III–V photovoltaics

    SciTech Connect

    Ritenour, Andrew J.; Boucher, Jason W.; DeLancey, Robert; Greenaway, Ann L.; Aloni, Shaul; Boettcher, Shannon W.

    2014-09-01

    We report the use of a simple close-spaced vapor transport technique for the growth of high-quality epitaxial GaAs films using potentially inexpensive GaAs powders as precursors. The free carrier type and density (1016 to 1019 cm–3) of the films were adjusted by addition of Te or Zn powder to the GaAs source powder. We show using photoelectrochemical and electron beam-induced current analyses that the minority carrier diffusion lengths of the n- and p-GaAs films reached ~3 μm and ~8 μm, respectively. Hall mobilities approach those achieved for GaAs grown by metal–organic chemical vapor deposition, 1000–4200 cm2 V–1 s–1 for n-GaAs and 50–240 cm V–1 s–1 for p-GaAs depending on doping level. We conclude that the electronic quality of GaAs grown by close-spaced vapor transport is similar to that of GaAs made using conventional techniques and is thus sufficient for high-performance photovoltaic applications.

  19. Doping and electronic properties of GaAs grown by close-spaced vapor transport from powder sources for scalable III–V photovoltaics

    DOE PAGESBeta

    Ritenour, Andrew J.; Boucher, Jason W.; DeLancey, Robert; Greenaway, Ann L.; Aloni, Shaul; Boettcher, Shannon W.

    2014-09-01

    We report the use of a simple close-spaced vapor transport technique for the growth of high-quality epitaxial GaAs films using potentially inexpensive GaAs powders as precursors. The free carrier type and density (1016 to 1019 cm–3) of the films were adjusted by addition of Te or Zn powder to the GaAs source powder. We show using photoelectrochemical and electron beam-induced current analyses that the minority carrier diffusion lengths of the n- and p-GaAs films reached ~3 μm and ~8 μm, respectively. Hall mobilities approach those achieved for GaAs grown by metal–organic chemical vapor deposition, 1000–4200 cm2 V–1 s–1 for n-GaAsmore » and 50–240 cm V–1 s–1 for p-GaAs depending on doping level. We conclude that the electronic quality of GaAs grown by close-spaced vapor transport is similar to that of GaAs made using conventional techniques and is thus sufficient for high-performance photovoltaic applications.« less

  20. Ab initio study of the strain dependent thermodynamics of Bi doping in GaAs

    NASA Astrophysics Data System (ADS)

    Jacobsen, Heather; Puchala, Brian; Kuech, Thomas F.; Morgan, Dane

    2012-08-01

    The thermodynamics of Bi incorporation into bulk and epitaxial GaAs was studied using density functional theory (DFT) and anharmonic elasticity calculations. The equilibrium concentration of Bi was determined as a function of epitaxial strain state, temperature, and growth conditions. For a bulk, unstrained system, Bi in GaAs under typical growth conditions (Ga-rich and Bi-metal-rich at 400 °C) has a dilute heat of solution of 572 meV/Bi and a solubility of x=5.2×10-5 in GaAs1-xBix. However, epitaxial strain can greatly enhance this solubility, and under the same conditions an epitaxial film of GaAs1-xBix with 5% in-plane tensile strain is predicted to have a Bi solubility of x=7.3×10-3, representing approximately a hundred times increase in solubility over the unstrained bulk case. Despite these potentially large increases in solubility, the equilibrium solubility is still very low compared to values that have been achieved experimentally through nonequilibrium growth. These values of solubility are also sensitive to the choice of the Bi reference state. If the primary route for phase separation is the formation of GaBi within the same structure, rather than Bi metal, GaBi would serve as the source/sink for Bi. If GaBi is used as the Bi reference state, the epitaxial formation energy on a bulk unstrained GaAs substrate is reduced dramatically to 144 meV/Bi, yielding a Bi solubility of x=0.083 in GaAs1-xBix. These calculations suggest that Bi solubility could be greatly enhanced if Bi metal formation is inhibited and the system is forced to remain constrained to the GaAs1-xBix structure. Although GaBi is not a naturally stable compound, it could potentially be stabilized through a combination of kinetic limitations and alloying.

  1. Design Issues of GaAs and AlGaAs Delta-Doped p-i-n Quantum-Well APD's

    NASA Technical Reports Server (NTRS)

    Wang, Yang

    1994-01-01

    We examine the basic design issues in the optimization of GaAs delta-doped and AlGAs delta-doped quantum-well avalanche photodiode (APD) structures using a theoretical analysis based on an ensemble Monte Carlo simulation. The devices are variations of the p-i-n doped quantum-well structure previously described in the literature. They have the same low-noise, high-gain and high-bandwidth features as the p-i-n doped quantum-well device. However, the use of delta doping provides far greater control or the doping concentrations within each stage possibly enhancing the extent to which the device can be depleted. As a result, it is expected that the proposed devices will operate at higher gain levels (at very low noise) than devices previously developed.

  2. Photoreflectance analysis of annealed vanadium-doped GaAs thin films grown by metalorganic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Fitouri, H.; Bilel, C.; Zaied, I.; Bchetnia, A.; Rebey, A.; El Jani, B.

    2015-09-01

    In this study, we investigate the optical properties of annealed vanadium-doped GaAs films grown on GaAs substrates by metalorganic vapor phase epitaxy. The temperature dependence of the photoreflectance (PR) of as-grown GaAs:V films has been studied. We used the fit with Third-Derivative Functional Form model to evaluate the physical parameters. The temperature dependence of band gap and spin-orbit energies can be described by the Bose-Einstein statistical expression. The PR spectra of the samples are measured after thermal annealing in order to check any improvement in the optical quality of the material. The PR signal amplitude of GaAs:V samples decreased after thermal annealing. Degradation of the PR signal for annealing temperature at about 850 °C is observed revealing a poor quality of the layer surface states and an important density of the recombination centers. The lock-in phase analysis of PR spectra allows to determine the time constant for GaAs:V sample before and after thermal annealing.

  3. First Principles Electronic Structure of Mn doped GaAs, GaP, and GaN Semiconductors

    SciTech Connect

    Schulthess, Thomas C; Temmerman, Walter M; Szotek, Zdzislawa; Svane, Axel; Petit, Leon

    2007-01-01

    We present first-principles electronic structure calculations of Mn doped III-V semiconductors based on the local spin-density approximation (LSDA) as well as the self-interaction corrected local spin density method (SIC-LSD). We find that it is crucial to use a self-interaction free approach to properly describe the electronic ground state. The SIC-LSD calculations predict the proper electronic ground state configuration for Mn in GaAs, GaP, and GaN. Excellent quantitative agreement with experiment is found for magnetic moment and p-d exchange in (GaMn)As. These results allow us to validate commonly used models for magnetic semiconductors. Furthermore, we discuss the delicate problem of extracting binding energies of localized levels from density functional theory calculations. We propose three approaches to take into account final state effects to estimate the binding energies of the Mn-d levels in GaAs. We find good agreement between computed values and estimates from photoemisison experiments.

  4. Comparison of OARE Accelerometer Data with Dopant Distribution in Se-Doped GaAs Crystals Grown During USML-1

    NASA Technical Reports Server (NTRS)

    Moskowitz, Milton E.; Bly, Jennifer M.; Matthiesen, David H.

    1997-01-01

    Experiments were conducted in the crystal growth furnace (CGF) during the first United States Microgravity Laboratory (USML-1), the STS-50 flight of the Space Shuttle Columbia, to determine the segregation behavior of selenium in bulk GaAs in a microgravity environment. After the flight, the selenium-doped GaAs crystals were sectioned, polished, and analyzed to determine the free carrier concentration as a function of position, One of the two crystals initially exhibited an axial concentration profile indicative of diffusion controlled growth, but this profile then changed to that predicted for a complete mixing type growth. An analytical model, proposed by Naumann [R.J. Naumann, J. Crystal Growth 142 (1994) 253], was utilized to predict the maximum allowable microgravity disturbances transverse to the growth direction during the two different translation rates used for each of the experiments. The predicted allowable acceleration levels were 4.86 microgram for the 2.5 micrometers/s furnace translation rate and 38.9 microgram for the 5.0 micrometers/s rate. These predicted values were compared to the Orbital Acceleration Research Experiment (OARE) accelerometer data recorded during the crystal growth periods for these experiments. Based on the analysis of the OARE acceleration data and utilizing the predictions from the analytical model, it is concluded that the change in segregation behavior was not caused by any acceleration events in the microgravity environment.

  5. Evaluation of modulating field of photoreflectance of surface-intrinsic-n+ type doped GaAs by using photoinduced voltage

    NASA Astrophysics Data System (ADS)

    Lee, W. Y.; Chien, J. Y.; Wang, D. P.; Huang, K. F.; Huang, T. C.

    2002-04-01

    Photoreflectance (PR) of surface-intrinsic-n+ type doped GaAs has been measured for various power densities of pump laser. The spectra exhibited many Franz-Keldysh oscillations, whereby the strength of electric field F in the undoped layer can be determined. The thus obtained Fs are subject to photovoltaic effect and are less than built-in field Fbi. In the previous work we have obtained the relation F≈Fbi-δF/2 when δF≪Fbi by using electroreflectance to simulate PR, where δF is the modulating field of the pump beam. In this work a method was devised to evaluate δF by using photoinduced voltages Vs and, hence, the relation can be verified by PR itself. The δFs obtained by Vs are also consistent with those of using imaginary part of fast Fourier transform of PR spectra.

  6. A 4-W 56-dB gain microstrip amplifier at 15 GHz utilizing GaAs FET's and IMPATT diodes

    NASA Technical Reports Server (NTRS)

    Sokolov, V.; Namordi, M. R.; Doerbeck, F. H.

    1979-01-01

    Performance results and design considerations are presented for an all solid-state Ku-band power amplifier which is feasible for use in PM communication systems for airborne or spacecraft transmitter applications. A six-stage GaAs FET preamplifier and a driver and balanced power amplifier utilizing GaAs IMPATT diodes operating in the injection locked oscillator mode are discussed. For high power and efficiency Schottky-Read IMPATT's with low-high-low doping profiles are employed. For improved reliability the IMPATT's incorporate a TiW barrier metallization to retard degradation of the IMPATT's. Results of accelerated life testing of the IMPATT devices are also presented.

  7. Mn5Ge3C0.6 /Ge(1 1 1) Schottky contacts tuned by an n-type ultra-shallow doping layer

    NASA Astrophysics Data System (ADS)

    Petit, Matthieu; Hayakawa, Ryoma; Wakayama, Yutaka; Le Thanh, Vinh; Michez, Lisa

    2016-09-01

    Mn5Ge3C x compound is of great interest for spintronics applications. The various parameters of Au/Mn5Ge3C0.6/Ge(1 1 1) and Au/Mn5Ge3C0.6/δ-doped Ge(1 1 1) Schottky diodes were measured in the temperature range of 30–300 K by using current–voltage and capacitance–voltage techniques. The Schottky barrier heights and ideality factors were found to be temperature dependent. These anomalous behaviours were explained by Schottky barrier inhomogeneities and interpreted by means of a Gaussian distribution model of the Schottky barrier heights. Following this approach we show that the Mn5Ge3C0.6/Ge contact is described with a single Gaussian distribution and a conduction mechanism mainly based on the thermoionic emission. On the other hand the Mn5Ge3C0.6/δ-doped Ge contact is depicted with two Gaussian distributions according to the temperature and a thermionic-field emission process. The differences between the two types of contacts are discussed according to the distinctive features of the growth of heavily doped germanium thin films.

  8. Ultraviolet band-pass Schottky barrier photodetectors formed by Al-doped ZnO contacts to n-GaN

    SciTech Connect

    Sheu, J.K.; Lee, M.L.; Tun, C.J.; Lin, S.W.

    2006-01-23

    This work prepared Al-doped ZnO(AZO) films using dc sputtering to form Schottky contacts onto GaN films with low-temperature-grown GaN cap layer. Application of ultraviolet photodetector showed that spectral responsivity exhibits a narrow bandpass characteristic ranging from 345 to 375 nm. Moreover, unbiased peak responsivity was estimated to be around 0.12 A/W at 365 nm, which corresponds to a quantum efficiency of around 40%. In our study, relatively low responsivity can be explained by the marked absorption of the AZO contact layer. When the reverse biases were below 5 V, the study revealed that dark currents were well below 5x10{sup -12} A even though the samples were annealed at increased temperatures.

  9. Structural and magnetic characteristics of MnAs nanoclusters embedded in Be-doped GaAs

    NASA Astrophysics Data System (ADS)

    Rench, D. W.; Schiffer, P.; Samarth, N.

    2011-09-01

    We describe a systematic study of the synthesis, microstructure, and magnetization of hybrid ferromagnet-semiconductor nanomaterials comprised of MnAs nanoclusters embedded in a p-doped GaAs matrix. These samples are created during the in situ annealing of Be-doped (Ga,Mn)As heterostructures grown by molecular beam epitaxy. Transmission electron microscopy and magnetometry studies reveal two distinct classes of nanoclustered samples whose structural and magnetic properties depend on the Mn content of the initial (Ga,Mn)As layer. For Mn content in the range 5-7.5%, annealing creates a superparamagnetic material with a uniform distribution of small clusters (diameter ˜6 nm) and with a low blocking temperature (TB˜10 K). While transmission electron microscopy cannot definitively identify the composition and crystalline phase of these small clusters, our experimental data suggest that they may be comprised of either zinc-blende MnAs or Mn-rich regions of (Ga,Mn)As. At higher Mn content (≳8%), we find that annealing results in an inhomogeneous distribution of both small clusters as well as much larger NiAs-phase MnAs clusters (diameter ˜25 nm). These samples also exhibit supermagnetism, albeit with substantially larger magnetic moments and coercive fields, and blocking temperatures well above room temperature.

  10. Selfsimilar and fractal analysis of n-type delta-doped quasiregular GaAs quantum wells

    SciTech Connect

    García-Cervantes, H.; Rodríguez-Vargas, I.

    2014-05-15

    We study the electronic structure of n-type delta-doped quantum wells in GaAs in which the multiple well system is built according to the Fibonacci sequence. The building blocks A and B correspond to delta-doped wells with impurities densities n{sub 2DA} and n{sub 2DB}, and the same well width. The Thomas-Fermi approximation, the semi-empirical sp{sub 3}s* tight-binding model including spin, the Surface Green Function Matching method and the Transfer Matrix approach were implemented to obtain the confining potential, the electronic structure and the selfsimilarity of the spectrum. The fragmentation of the electronic spectra is observed whenever the building blocks A and B interact and it increases as the difference of impurities density between A and B increases as well. The wave function of the first sate of the fragmented bands presents critical characteristics, this is, it is not a localized state nor a extended one as well as it has selfsimilar features. So, the quasiregular characteristics are preserved irrespective of the complexity of the system and can affect the performance of devices based on these structures.

  11. The influence of Sb doping on the growth and electronic properties of GaAs(100) and AlGaAs(100)

    NASA Technical Reports Server (NTRS)

    Jamison, K. D.; Chen, H. C.; Bensaoula, A.; Lim, W.; Trombetta, L.

    1989-01-01

    Isoelectronic doping using antimony has been shown to reduce traps and improve material properties during epitaxial growth of Si doped GaAs(100) and AlGaAs(100). In this study, the effect of the antimony dopant on the optimal growth temperature is examined with the aim of producing high-quality heterostructures at lower temperatues. High-quality films of GaAs and AlGaAs have been grown by molecular-beam epitaxy at the normal growth temperatures of 610 and 700 C, respectively, and 50-100 C below this temperature using varying small amounts of Sb as a dopant. Electrical properties of the films were then examined using Hall mobility measurements and deep-level transient spectroscopy.

  12. Low defect densities in molecular beam epitaxial GaAs achieved by isoelectronic In doping

    NASA Technical Reports Server (NTRS)

    Bhattacharya, P. K.; Dhar, S.; Berger, P.; Juang, F.-Y.

    1986-01-01

    A study has been made of the effects of adding small amounts of In (0.2-1.2 pct) to GaAs grown by molecular beam epitaxy. The density of four electron traps decreases in concentration by an order of magnitude, and the peak intensities of prominent emissions in the excitonic spectra are reduced with increase in In content. Based on the higher surface migration rate of In, compared to Ga, at the growth temperatures it is apparent that the traps and the excitonic transitions are related to point defects. This agrees with earlier observations by Briones and Collins (1982) and Skromme et al. (1985).

  13. MeV implantation studies in LPE (liquid phase epitaxy)-grown GaAs and InP. Final report, 1 October 1987-31 March 1989

    SciTech Connect

    Park, Y.S.

    1989-03-31

    Research was conducted on growth and evaluation of high-quality gallium arsenide layers using liquid phase epitaxy (LPE) and on MeV ion-implantation processings of molecular beam epitaxy (MBE) grown GaInAs layers on GaAs and LPE-grown GaAs layers on GaAs. By a novel growth method i.e., isoelectronic doping of LPE GaAs layers with indium, high structural and electrical-quality layers were successfully grown. In the as-grown indium-doped LPE GaAs layers, the etch-pit density, rocking-curve FWHM, and the ideality factor of a Schottky diode improved significantly, showing an optimal In doping density of 2.4 x 10/sup 19/. The effects of MeV-ion bombardment in a strained but partially relaxed GaInAs epitaxial layers on GaAs were systematically investigated. Depending on the state of initial relaxation, film thickness, and incident ion-beam current, the lattice strain changed differently with the increasing ion-beam dose.

  14. Lattice expansion, stability, and Mn solubility in substitutionally Mn-doped GaAs

    NASA Astrophysics Data System (ADS)

    Nakamura, Kohji; Hatano, Keishi; Akiyama, Toru; Ito, Tomonori; Freeman, A. J.

    2007-05-01

    The structural properties and stability of zinc-blende GaxMn1-xAs over the whole Mn composition range are studied by means of the highly precise full-potential linearized augmented plane-wave method and the Connolly-Williams cluster expansion method, within the local-density approximation (LDA), generalized gradient approximation (GGA), and LDA+U . In contrast to LDA and GGA predictions, the calculated LDA+U lattice constant is found to increase when the Mn composition increases, even in the case that the Mn atoms substitutionally occupy cation sites, due to the correlation correction of the pd hybridization strength between the Mn3d bands and the As4p valence bands, which agrees with recent experimental findings. In addition, we confirm that the system has a tendency to segregate into GaAs and MnAs, and so inherently favors clustering. A temperature-composition phase diagram is obtained with the mean-field approximation for the entropy, in which the Mn solubility into GaAs is found to be very low at low temperatures (˜300°C) .

  15. Heat load of a P-doped GaAs photocathode in SRF electron gun

    SciTech Connect

    Wang, E.; Ben-Zvi, I.; Kewisch, J.; Burrill, A.; Rao, T.; Wu, Q.; Jain, A.; Gupta, R.; Holmes, D.

    2010-05-23

    Many efforts were made over the last decades to develop a better polarized electron source for the high energy physics. Several laboratories operate DC guns with the Gallium-Arsenide photo-cathode, which yield a highly polarized electron beam. However, the beam's emittance might well be improved using a Superconducting RF electron gun, which delivers beams of higher brightness than DC guns does, because the field gradient at the cathode is higher. SRF guns with metal cathodes and CsTe cathodes have been tested successfully. To produce polarized electrons, a Gallium-Arsenide photo-cathode must be used: an experiment to do so in a superconducting RF gun is under way at BNL. Since the cathode will be normal conducting, the problem about the heat load stemming from the cathode arises. We present our measurements of the electrical resistance of GaAs at cryogenic temperatures, a prediction of the heat load and the verification by measuring the quality factor of the gun with and without cathode.

  16. GaAs Self-Aligned JFETS with Carbon-Doped P+ Region

    SciTech Connect

    Allerman, A.A.; Baca, A.G.; Chang, P.C.; Drummond, T.J.

    1999-02-15

    Self-aligned JFETs with a carbon-doped p{sup +} region have been reported for the first time. For these JFETs, both the channel and p{sup +} region were grown by metal organic chemical vapor deposition (MOCVD) and are termed epitaxial JFETs in this study. The epitaxial JFETs were compared to ion implanted JFETs of similar channel doping and threshold voltage. Both JFETs were fabricated using the same self-aligned process for doping the source and drain regions of the JFET and for eliminating excess gate capacitance of conventional JFETs. The gate turn-on voltage for the epitaxial JFETs was 1.06 V, about 0.1 V higher than for the implanted JFETs. The reverse breakdown voltage was similar for both JFETs but the reverse gate leakage current of the epitaxial JFETs was 1-3 orders of magnitude less than the implanted JFETs. The epitaxial JFETs also showed higher transconductance and lower knee voltage than the implanted JFETs.

  17. Hydrogen sulphide doping of GaAs and AlxGa1-xAs grown by molecular beam epitaxy (MBE)

    NASA Astrophysics Data System (ADS)

    Briones, F.; Golmayo, D.; González, L.; de Miguel, J. L.

    1985-03-01

    H2S gas has been used during molecular beam epitaxy (MBE) growth of GaAs and Al x Ga1- x As as sulphur vector for n-type doping. Doping efficiencies are less than 10-3 at usual growth temperatures, and are limited by an incorporation competitive surface process, probably 2Ga+H2S→Ga2S+H2. In AlxGa1- x As for x≧0.2 the doping efficiency is further reduced by carrier freeze-out at deep levels. Measured thermal activation energies depend on growth conditions and remain relatively low even up to the direct-indirect bandgap crossover for substrate temperatures in the 585 645 ‡C range.

  18. Dislocation lines in indium-doped GaAs crystals observed by infrared light scattering tomography of about 1 μm wavelength radiation

    NASA Astrophysics Data System (ADS)

    Ogawa, Tomoya

    1988-05-01

    Decorated dislocation lines in GaAs crystals are remarkably well observed by scattering of an infrared laser beam in the 1 μm wavelength range. Some of these dislocation lines are also observed by absorption imaging in the same wavelength region but others are only detected by light scattering. Furthermore, the former lines correspond to the pits etched by molten KOH. Dislocation lines in In-doped GaAs crystals grown by the LEC method from nearly stoichiometric melts are studied in connection with their growth history, where grown-in dislocation lines are bent at growth interfaces to react with each other and then their density is decreased. At the shoulder part of the ingots, many slip dislocations are found, where most dislocation lines are so isolated that they are clearly and individually observed by light scattering tomography without etching.

  19. Characteristic of photocurrent decline of transmission-mode equally doped GaAs photocathode

    NASA Astrophysics Data System (ADS)

    Zhang, Dong Lian; Shi, Feng; Gao, Xiang; Cheng, Hong-Chang; Miao, Zhuang; Niu, Sen; Wang, Long; Chen, Chang

    2014-09-01

    Photocurrent of GaAs photocathode activated with Cs and O was tested by auto-activation monitor, the fitting curves of photocurrent showed that the photocurrent of the photocathode after the first activation declines exponentially, and then declines linearly with very small slope |k1|; the photocurrent after the second activation rises exponentially, and then declines linearly with a slope|k2| which is a bit larger than |k1|.Based on the mechanism difference between twice annealing of the photocathode, the degeneration behavior of the photocathode was analyzed by three-dipoles model and XPS test after the first activation and succedent thermal cleaning. It is indicated that Cs2O dipoles on the surface are saturated after the photocathode was activated for the first time, the remained Cs and Cs2O in the ultra-high vacuum chamber which deposited on the photocathode surface will prevent the emission of photoelectrons. The photocathode surface with Cs and O reconstructed when it was annealing for the second time, a lot of Cs2O dipoles changed into more stable GaAs-O-Cs dipoles, and this phenomenon would happened immediately as soon as the photocathode was activating for the second time. After the residual Cs and Cs2O dipoles depleted, the neutral gas CO2, H2O, O2, damaging the surface dipoles layer, are the main factors resulted in the decline of photocurrent. Due to the instable Cs2O dipoles on the surface of photocathode have greater chances of converting into stable GaAs-O-Cs dipoles when photocathode was activated for the first time, the photocurrent declines more slowly compared with the second activation. The discussion for the phenomenon is of great significance for exploring the photoemission mechanism of Ⅲ-Ⅴ semiconductors.

  20. Growth studies of erbium-doped GaAs deposited by metalorganic vapor phase epitaxy using noval cyclopentadienyl-based erbium sources

    NASA Technical Reports Server (NTRS)

    Redwing, J. M.; Kuech, T. F.; Gordon, D. C.; Vaartstra, B. A.; Lau, S. S.

    1994-01-01

    Erbium-doped GaAS layers were grown by metalorganic vapor phase epitaxy using two new sources, bis(i-propylcyclopentadienyl)cyclopentadienyl erbium and tris(t-butylcyclopentadienyl) erbium. Controlled Er doping in the range of 10(exp 17) - 10(exp 18)/cu cm was achieved using a relatively low source temperature of 90 C. The doping exhibits a second-order dependence on inlet source partial pressure, similar to behavior obtained with cyclopentadienyl Mg dopant sources. Equivalent amounts of oxygen and Er are present in 'as-grown' films indicating that the majority of Er dopants probably exist as Er-O complexes in the material. Er(+3) luminescence at 1.54 micrometers was measured from the as-grown films, but ion implantation of additional oxygen decreases the emission intensity. Electrical compensation of n-type GaAs layers codoped with Er and Si is directly correlated to the Er concentration is proposed to arise from the deep centers associated with Er which are responsible for a broad emission band near 0.90 micrometers present in the photoluminescence spectra of GaAs:Si, Er films.

  1. Conduction mechanism in highly doped β-Ga2O3(\\bar{2}01) single crystals grown by edge-defined film-fed growth method and their Schottky barrier diodes

    NASA Astrophysics Data System (ADS)

    Oishi, Toshiyuki; Harada, Kazuya; Koga, Yuta; Kasu, Makoto

    2016-03-01

    Edge-defined fed-grown (\\bar{2}01) β-Ga2O3 single crystals with high electron concentration of 3.9 × 1018 cm-3 at 300 K were characterized by Hall effect measurement, and Schottky barrier diodes have been demonstrated. Electron mobility was as high as 74 cm2/(V·s) at 300 K regardless of the high doping concentration. The electron concentration did not change substantially in the low temperature below 160 K. This properties can be explained by the two-band model due to the inter-band conduction. On the Schottky barrier diodes, the rectification characteristics were clearly observed, and the current density of 96.8 A/cm2 at the forward voltage of 1.6 V was obtained.

  2. Investigation of the optical properties of GaAs with δ-Si doping grown by molecular-beam epitaxy at low temperatures

    SciTech Connect

    Lavrukhin, D. V. Yachmenev, A. E.; Bugaev, A. S.; Galiev, G. B.; Klimov, E. A.; Khabibullin, R. A.; Ponomarev, D. S.; Maltsev, P. P.

    2015-07-15

    Molecular-beam epitaxy is used for the preparation of structures based on “low-temperature” grown GaAs with introduced d-Si doping. Specific features in the photon-energy range of 1.28–1.48 eV are observed in the photoluminescence spectrum after structures annealing at temperatures of 520 and 580°C; these features are related to the formation of point defects and their complexes. The “pump–probe” light transmission measurements reveal that the characteristic lifetimes of nonequilibrium carriers in the fabricated structures amount to T{sup c} ≈ 1.2–1.5 ps.

  3. On the growth mechanism of Li- and Na-doped Zn chalcogenides on GaAs(001) by means of molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Ohishi, M.; Yoneta, M.; Ishii, S.; Ohura, M.; Hiroe, Y.; Saito, H.

    1996-02-01

    Sharp and semicircular patterns were observed in RHEED during the MBE growth of Li- or Na-acceptor doped ZnSe and ZnS on GaAs(001). The radius and the separation between the diffraction circles vary with the change of the azimuth of the incident electron beam. Calculated diffraction patterns assuming that Li or Na atoms are arrayed one-dimensionally along the [110] direction of the crystal axis are in good agreement with the experimental results. We conclude that Li or Na atoms are incorporated at the [110] terrace steps, which prevents the further growth from the step edge.

  4. Magnesium doping of efficient GaAs and Ga(0.75)In(0.25)As solar cells grown by metalorganic chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Lewis, C. R.; Ford, C. W.; Werthen, J. G.

    1984-01-01

    Magnesium has been substituted for zinc in GaAs and Ga(0.75)In(0.25)As solar cells grown by metalorganic chemical vapor deposition (MOCVD). Bis(cyclopentadienyl)magnesium (Cp2Mg) is used as the MOCVD transport agent for Mg. Full retention of excellent material quality and efficient cell performance results. The substitution of Mg for Zn would enhance the abruptness and reproducibility of doping profiles, and facilitate high temperature processing and operation, due to the much lower diffusion coefficient of Mg, relative to Zn, in these materials.

  5. Self-Aligned Guard Rings For Schottky-Barrier Diodes

    NASA Technical Reports Server (NTRS)

    Lin, True-Lon

    1990-01-01

    Proposed self-aligned guard ring increases active area of Schottky-barrier infrared detector. Concept developed for silicide Schottky-barrier diodes in which platinum silicide or iridium silicide Schottky-contacts provide cutoff wavelengths of about 6 or 10 micrometers. Grid of silicon dioxide doped with phosphorus etched on silicon wafer, and phosphorus from grid diffused into substrate, creating n-type guard rings. Silicide layers formed in open areas of grid. Overlap of guard rings and silicide layers small.

  6. Selective-area growth of heavily n-doped GaAs nanostubs on Si(001) by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Chang, Yoon Jung; Simmonds, Paul J.; Beekley, Brett; Goorsky, Mark S.; Woo, Jason C. S.

    2016-04-01

    Using an aspect ratio trapping technique, we demonstrate molecular beam epitaxy of GaAs nanostubs on Si(001) substrates. Nanoholes in a SiO2 mask act as a template for GaAs-on-Si selective-area growth (SAG) of nanostubs 120 nm tall and ≤100 nm in diameter. We investigate the influence of growth parameters including substrate temperature and growth rate on SAG. Optimizing these parameters results in complete selectivity with GaAs growth only on the exposed Si(001). Due to the confined-geometry, strain and defects in the GaAs nanostubs are restricted in lateral dimensions, and surface energy is further minimized. We assess the electrical properties of the selectively grown GaAs nanostubs by fabricating heterogeneous p+-Si/n+-GaAs p-n diodes.

  7. Schottky barrier solar cell

    SciTech Connect

    Stirn, R.J.; Yeh, Y.C.M.

    1981-07-01

    A method of fabricating a Schottky barrier solar cell is described. The cell consists of a thin substrate of low cost material with at least the top surface of the substrate being electrically conductive. A thin layer of heavily doped n-type polycrystalling germanium is deposited on the substrate after a passivation layer is deposited to prevent migration of impurities into the polycrystalline germanium. The polycrystalline germanium is recrystallized to increase the crystal sizes to serve as a base layer on which a thin layer of gallium arsenide is vapor-epitaxilly grown followed by a thermally-grown oxide layer. A metal layer is deposited on the oxide layer and a grid electrode is deposited to be in electrical contact with the top surface of the metal layer. Official Gazette of the U.S. Patent and Trademark Office

  8. Schottky barrier solar cell

    NASA Technical Reports Server (NTRS)

    Stirn, R. J.; Yeh, Y. C. M. (Inventor)

    1981-01-01

    A method of fabricating a Schottky barrier solar cell is described. The cell consists of a thin substrate of low cost material with at least the top surface of the substrate being electrically conductive. A thin layer of heavily doped n-type polycrystalling germanium is deposited on the substrate after a passivation layer is deposited to prevent migration of impurities into the polycrystalline germanium. The polycrystalline germanium is recrystallized to increase the crystal sizes to serve as a base layer on which a thin layer of gallium arsenide is vapor-epitaxilly grown followed by a thermally-grown oxide layer. A metal layer is deposited on the oxide layer and a grid electrode is deposited to be in electrical contact with the top surface of the metal layer.

  9. Influence of the counter ion on the properties of organic and inorganic acid doped polyaniline and their Schottky diodes

    NASA Astrophysics Data System (ADS)

    Ashokan, S.; Ponnuswamy, V.; Jayamurugan, P.; Chandrasekaran, J.; Subba Rao, Y. V.

    2015-09-01

    Pure and doped Polyaniline (PANI) was prepared by chemical oxidative polymerization of aniline. The FT-IR spectrum confirms the presence of dopants in PANI functional groups of SO32- groups in PANI. SEM morphology reveals the various shapes and size of the PANI. UV-Vis spectra confirm the absorption peaks at 270 and 340 nm is due to the π-π∗ transition of the benzenoid rings. The strong absorption peak around 603 nm showed extension of polymer chains. PL studies of PANI reveal the emission peaks around 325 nm and 510 nm of PANI. The conductivity measurements are carried out for the prepared PANI's pellets. The heterojunction device structure In/PANI-DBSA/Al and In/PANI-HCl/Al was made to fabricate by thermal evaporation method. The current voltage (I-V) characteristics of these devices are weak rectifying behavior with the non-linear nature. The diode parameters such as ideality factor, barrier height and saturation current densities were calculated using the modified Shockley equation.

  10. Low-temperature grown GaAs heterojunction metal-semiconductor-metal photodetectors improve speed and efficiency

    NASA Astrophysics Data System (ADS)

    Currie, Marc; Quaranta, Fabio; Cola, Adriano; Gallo, Eric M.; Nabet, Bahram

    2011-11-01

    Low-temperature-grown GaAs (LT-GaAs) has a picosecond recombination lifetime, making a fast photodetector material but limiting carrier mobility and collection efficiency. Here, a metal-semiconductor-metal photodetector with a thin channel of regular-temperature GaAs (RT-GaAs) above LT-GaAs provides fast transit between contacts. A p-type delta doping layer below these layers produces a vertical electric field forcing optically generated electrons towards the channel. The AlGaAs/RT-GaAs heterojunction increases Schottky contacts, and the resulting 8-22 μm pitch photodetectors have low (<1-nA) dark current, 12-ps (oscilloscope-limited) pulsewidth, and 0.15-A/W responsivity. The devices demonstrate that fast LT-GaAs pulses are achievable with responsivity similar to RT-GaAs.

  11. Observation of linear I-V curves on vertical GaAs nanowires with atomic force microscope

    NASA Astrophysics Data System (ADS)

    Geydt, P.; Alekseev, P. A.; Dunaevskiy, M.; Lähderanta, E.; Haggrén, T.; Kakko, J.-P.; Lipsanen, H.

    2015-12-01

    In this work we demonstrate the possibility of studying the current-voltage characteristics for single vertically standing semiconductor nanowires on standard AFM equipped by current measuring module in PeakForce Tapping mode. On the basis of research of eight different samples of p-doped GaAs nanowires grown on different GaAs substrates, peculiar electrical effects were revealed. It was found how covering of substrate surface by SiOx layer increases the current, as well as phosphorous passivation of the grown nanowires. Elimination of the Schottky barrier between golden cap and the top parts of nanowires was observed. It was additionally studied that charge accumulation on the shell of single nanowires affects its resistivity and causes the hysteresis loops on I-V curves.

  12. Absorption coefficient and relative refractive index change for a double δ-doped GaAs MIGFET-like structure: Electric and magnetic field effects

    NASA Astrophysics Data System (ADS)

    Martínez-Orozco, J. C.; Rodríguez-Magdaleno, K. A.; Suárez-López, J. R.; Duque, C. A.; Restrepo, R. L.

    2016-04-01

    In this work we present theoretical results for the electronic structure as well as for the absorption coefficient and relative refractive index change for an asymmetric double δ-doped like confining potential in the active region of a Multiple Independent Gate Field Effect Transistor (MIGFET) system. We model the potential profile as a double δ-doped like potential profile between two Schottky (parabolic) potential barriers that are just the main characteristics of the MIGFET configuration. We investigate the effect of external electromagnetic fields in this kind of quantum structures, in particular we applied a homogeneous constant electric field in the growth direction z as well as a homogeneous constant magnetic field in the x-direction. In general we conclude that by applying electromagnetic fields we can modulate the resonant peaks of the absorption coefficient as well as their energy position. Also with such probes it is possible to control the nodes and amplitude of the relative refractive index changes related to resonant intersubband optical transitions.

  13. 808-nm diode-pumped dual-wavelength passively Q-switched Nd:LuLiF4 laser with Bi-doped GaAs

    NASA Astrophysics Data System (ADS)

    Li, S. X.; Li, T.; Li, D. C.; Zhao, S. Z.; Li, G. Q.; Hang, Y.; Zhang, P. X.; Li, X. Y.; Qiao, H.

    2015-09-01

    Diode-pumped CW and passively Q-switched Nd:LuLiF4 lasers with stable, synchronous dual-wavelength operations near 1047 and 1053 nm were demonstrated for the first time. The maximal CW output power of 821 mW was obtained at an incident pump power of 6.52 W. Employing high quality Bi-doped GaAs as saturable absorber, stable dual-wavelength Q-switched operation was realized. Under 6.52 W incident pump power, the minimal pulse duration of 1.5 ns, the largest single pulse energy of 11.32 μJ, and the highest peak power of 7.25 kW were achieved.

  14. Direct identification of interstitial Mn in heavily p-type doped GaAs and evidence of its high thermal stability

    SciTech Connect

    Pereira, L. M. C.; Wahl, U.; Correia, J. G.; Decoster, S.; Vantomme, A.; Silva, M. R. da; Araujo, J. P.

    2011-05-16

    We report on the lattice location of Mn in heavily p-type doped GaAs by means of {beta}{sup -} emission channeling from the decay of {sup 56}Mn. The majority of the Mn atoms substitute for Ga and up to 31% occupy the tetrahedral interstitial site with As nearest neighbors. Contrary to the general belief, we find that interstitial Mn is immobile up to 400 deg. C, with an activation energy for diffusion of 1.7-2.3 eV. Such high thermal stability of interstitial Mn has significant implications on the strategies and prospects for achieving room temperature ferromagnetism in Ga{sub 1-x}Mn{sub x}As.

  15. Heteroepitaxial growth and multiferroic properties of Mn-doped BiFeO3 films on SrTiO3 buffered III-V semiconductor GaAs

    NASA Astrophysics Data System (ADS)

    Gao, G. Y.; Yang, Z. B.; Huang, W.; Zeng, H. Z.; Wang, Y.; Chan, H. L. W.; Wu, W. B.; Hao, J. H.

    2013-09-01

    Epitaxial Mn-doped BiFeO3 (MBFO) thin films were grown on GaAs (001) substrate with SrTiO3 (STO) buffer layer by pulsed laser deposition. X-ray diffraction results demonstrate that the films show pure (00l) orientation, and MBFO (100)//STO(100), whereas STO (100)//GaAs (110). Piezoresponse force microscopy images and polarization versus electric field loops indicate that the MBFO films grown on GaAs have an effective ferroelectric switching. The MBFO films exhibit good ferroelectric behavior (2Pr ˜ 92 μC/cm2 and 2EC ˜ 372 kV/cm). Ferromagnetic property with saturated magnetization of 6.5 emu/cm3 and coercive field of about 123 Oe is also found in the heterostructure at room temperature.

  16. Studies on metal/n-GaAs Schottky barrier diodes: The effects of temperature and carrier concentrations

    SciTech Connect

    Mangal, Sutanu; Banerji, P.

    2009-04-15

    Metal/Semiconductor Schottky diodes were fabricated to study the effect of temperature and carrier concentrations on diode parameters, such as ideality factor and barrier heights. The diodes were formed on the epitaxial layers of metal organic chemical vapor deposition (MOCVD) grown n-GaAs with metals such as Al, Pd, and Zn-Pd deposited onto n-GaAs by thermal evaporation technique. Trimethyl gallium and AsH{sub 3} were used as Ga and As precursors, respectively, to grow GaAs on semi-insulating GaAs substrates at 600 deg. C and H{sub 2}S was used for n-type doping in a horizontal reactor atmospheric pressure MOCVD system. The Schottky diodes were characterized by forward bias current-voltage measurements in the temperature range 130-300 K and capacitance-voltage measurement at room temperature and diode parameters such as ideality factor and barrier height have been evaluated. It is found that the Schottky barrier height decreases with decrease in temperature while the ideality factor increases. It is also observed that the barrier height increases linearly with the applied forward bias voltage and the rate of change of barrier height with voltage increases for higher carrier concentration of the semiconductor. The carrier concentration of n-GaAs was chosen in the regime 1x10{sup 16}-8.2x10{sup 16} cm{sup -3} so that the depletion region extends inside the semiconductor and the diode can be used as a III-V photovoltaic device.

  17. Structural properties of pressure-induced structural phase transition of Si-doped GaAs by angular-dispersive X-ray diffraction

    NASA Astrophysics Data System (ADS)

    Lin, Kung-Liang; Lin, Chih-Ming; Lin, Yu-Sheng; Jian, Sheng-Rui; Liao, Yen-Fa; Chuang, Yu-Chun; Wang, Chuan-Sheng; Juang, Jenh-Yih

    2016-02-01

    Pressure-induced phase transitions in n-type silicon-doped gallium arsenide (GaAs:Si ) at ambient temperature were investigated by using angular-dispersive X-ray diffraction (ADXRD) under high pressure up to around 18.6 (1) GPa, with a 4:1 (in volume ratio) methanol-ethanol mixture as the pressure-transmitting medium. In situ ADXRD measurements revealed that n-type GaAs:Si starts to transform from zinc- blende structure to an orthorhombic structure [GaAs-II phase], space group Pmm2, at 16.4 (1) GPa. In contrast to previous studies of pure GaAs under pressure, our results show no evidence of structural transition to Fmmm or Cmcm phase. The fitting of volume compression data to the third-order Birch-Murnaghan equation of state yielded that the zero-pressure isothermal bulk moduli and the first-pressure derivatives were 75 (3) GPa and 6.4 (9) for the B3 phase, respectively. After decompressing to the ambient pressure, the GaAs:Si appears to revert to the B3 phase completely. By fitting to the empirical relations, the Knoop microhardness numbers are between H PK = 6.21 and H A = 5.85, respectively, which are substantially smaller than the values of 7-7.5 for pure GaAs reported previously. A discontinuous drop in the pressure-dependent lattice parameter, N- N distances, and V/ V 0 was observed at a pressure of 11.5 (1) GPa, which was tentatively attributed to the pressure-induced dislocation activities in the crystal grown by vertical gradient freeze method.

  18. Development of bulk GaAs room temperature radiation detectors

    SciTech Connect

    McGregor, D.S.; Knoll, G.F. . Dept. of Nuclear Engineering); Eisen, Y. . Soreq Nuclear Research Center); Brake, R. )

    1992-10-01

    This paper reports on GaAs, a wide band gap semiconductor with potential use as a room temperature radiation detector. Various configurations of Schottky diode detectors were fabricated with bulk crystals of liquid encapsulated Czochralski (LEC) semi-insulating undoped GaAs material. Basic detector construction utilized one Ti/Au Schottky contact and one Au/Ge/Ni alloyed ohmic contact. Pulsed X-ray analysis indicated pulse decay times dependent on bias voltage. Pulse height analysis disclosed non-uniform electric field distributions across the detectors tentatively explained as a consequence of native deep level donors (EL2) in the crystal.

  19. Schottky barrier MOSFET systems and fabrication thereof

    DOEpatents

    Welch, James D.

    1997-01-01

    (MOS) device systems-utilizing Schottky barrier source and drain to channel region junctions are disclosed. Experimentally derived results which demonstrate operation of fabricated N-channel and P-channel Schottky barrier (MOSFET) devices, and of fabricated single devices with operational characteristics similar to (CMOS) and to a non-latching (SRC) are reported. Use of essentially non-rectifying Schottky barriers in (MOS) structures involving highly doped and the like and intrinsic semiconductor to allow non-rectifying interconnection of, and electrical accessing of device regions is also disclosed. Insulator effected low leakage current device geometries and fabrication procedures therefore are taught. Selective electrical interconnection of drain to drain, source to drain, or source to source, of N-channel and/or P-channel Schottky barrier (MOSFET) devices formed on P-type, N-type and Intrinsic semiconductor allows realization of Schottky Barrier (CMOS), (MOSFET) with (MOSFET) load, balanced differential (MOSFET) device systems and inverting and non-inverting single devices with operating characteristics similar to (CMOS), which devices can be utilized in modulation, as well as in voltage controled switching and effecting a direction of rectification.

  20. Schottky barrier MOSFET systems and fabrication thereof

    DOEpatents

    Welch, J.D.

    1997-09-02

    (MOS) device systems-utilizing Schottky barrier source and drain to channel region junctions are disclosed. Experimentally derived results which demonstrate operation of fabricated N-channel and P-channel Schottky barrier (MOSFET) devices, and of fabricated single devices with operational characteristics similar to (CMOS) and to a non-latching (SRC) are reported. Use of essentially non-rectifying Schottky barriers in (MOS) structures involving highly doped and the like and intrinsic semiconductor to allow non-rectifying interconnection of, and electrical accessing of device regions is also disclosed. Insulator effected low leakage current device geometries and fabrication procedures therefore are taught. Selective electrical interconnection of drain to drain, source to drain, or source to source, of N-channel and/or P-channel Schottky barrier (MOSFET) devices formed on P-type, N-type and Intrinsic semiconductor allows realization of Schottky Barrier (CMOS), (MOSFET) with (MOSFET) load, balanced differential (MOSFET) device systems and inverting and non-inverting single devices with operating characteristics similar to (CMOS), which devices can be utilized in modulation, as well as in voltage controlled switching and effecting a direction of rectification. 89 figs.

  1. Polycrystalline Diamond Schottky Diodes and Their Applications.

    NASA Astrophysics Data System (ADS)

    Zhao, Ganming

    In this work, four-hot-filament CVD techniques for in situ boron doped diamond synthesis on silicon substrates were extensively studied. A novel tungsten filament shape and arrangement used to obtain large-area, uniform, boron doped polycrystalline diamond thin films. Both the experimental results and radiative heat transfer analysis showed that this technique improved the uniformity of the substrate temperature. XRD, Raman and SEM studies indicate that large area, uniform, high quality polycrystalline diamond films were obtained. Schottky diodes were fabricated by either sputter deposition of silver or thermal evaporation of aluminum or gold, on boron doped diamond thin films. High forward current density and a high forward-to-reverse current ratio were exhibited by silver on diamond Schottky diodes. Schottky barrier heights and the majority carrier concentrations of both aluminum and gold contacted diodes were determined from the C-V measurements. Furthermore, a novel theoretical C-V-f analysis of deep level boron doped diamond Schottky diodes was performed. The analytical results agree well with the experimental results. Compressive stress was found to have a large effect on the forward biased I-V characteristics of the diamond Schottky diodes, whereas the effect on the reverse biased characteristics was relatively small. The stress effect on the forward biased diamond Schottky diode was attributed to piezojunction and piezoresistance effects. The measured force sensitivity of the diode was as high as 0.75 V/N at 1 mA forward bias. This result shows that CVD diamond device has potential for mechanical transducer applications. The quantitative photoresponse characteristics of the diodes were studied in the spectral range of 300 -1050 nm. Semi-transparent gold contacts were used for better photoresponse. Quantum efficiency as high as 50% was obtained at 500 nm, when a reverse bias of over 1 volt was applied. The Schottky barrier heights between either gold or

  2. Nonlinear optical studies and CO2 laser-induced melting of Zn-doped GaAs

    NASA Astrophysics Data System (ADS)

    James, R. B.; Mills, B. E.; Christie, W. H.; Eby, R. E.; Darken, L. S., Jr.

    1986-02-01

    The intensity dependence of the free-hole absorption of CO2 laser radiation in GaAs:Zn crystals has been measured. Experimental results pertaining to nonlinear optical transmission measurements, the topography of the laser-irradiated surfaces, deviations from stoichiometry in the near-surface region, the incorporation of oxygen, and the pulsed laser annealing of ion-implanted GaAs are discussed. The intensity dependence of the nonlinear absorption is found to be closely approximated by an inhomogeneously broadened two-level model; the measured level for the saturation intensity is in good agreement with theoretical calculations. An energy-density 'window' exists for which the resolidified layer is both crystalline and maintains a high degree of surface planarity. Ga-rich regions remain after the solidification of the molten layer. The amount of arsenic loss increases with increasing laser-energy density and number of laser shots.

  3. GaAs thin film epitaxy and x-ray detector development

    NASA Astrophysics Data System (ADS)

    Wynne, Dawnelle I.; Cardozo, B.; Haller, Eugene E.

    1999-10-01

    We report on the growth of high purity n-GaAs using Liquid Phase Epitaxy and on the fabrication of Schottky barrier diodes for use as x-ray detectors using these layers. Our epilayers are grown form an ultra-pure Ga solvent in a graphite boat in a hydrogen atmosphere. Growth is started at a temperature of approximately 800 degrees C; the temperature is ramped down at 2 degrees C/min. to room temperature. Our best epilayers show a net-residual-donor concentration of approximately 2 X 1012 cm-3, measured by Hall effect. Electron mobilities as high as 150,000 cm2 V-1 s-1 at 77K have been obtained. The residual donors have been analyzed by far IR photothermal ionization spectroscopy and found to be sulfur and silicon. Up to approximately 200 micrometers of epitaxial GaAs have been deposited using several sequential growth runs on semi-insulating and n+-doped substrates. Schottky barrier diodes have been fabricated using this epitaxial material and have been electrically characterized by current-voltage and capacitance-voltage measurements. The Schottky barriers are formed by electron beam evaporation of Pt films. The ohmic contacts are made by electron beam evaporated and alloyed Ni-Ge-Au films on the backside of the substrate. Several of our diodes exhibit dark currents of the order of 0.3-3.3 nA/mm2 at reverse biases depleting approximately 50 micrometers of the epilayer. Electrical characteristics and preliminary performance results of our Schottky diodes using 109Cd and 241Am gamma and x- ray radiation will be discussed.

  4. Potential pinch-off effect in inhomogeneous Au/Co/GaAs67P33(100)-Schottky contacts

    NASA Astrophysics Data System (ADS)

    Olbrich, Alexander; Vancea, Johann; Kreupl, Franz; Hoffmann, Horst

    1997-05-01

    In this work ballistic electron emission microscopy was used to probe on nanometer scale the local Schottky barrier height in metal-semiconductor (MS) contacts with an intentionally inhomogeneously prepared metallization. Schottky barrier maps of heterogeneous Au/Co/ GaAs67Poverflow="scroll">33(100)-Schottky contacts show areas with different barrier heights which can be correlated to different metallizations (Au or Co) at the interface. The local Schottky barrier height of the Co patches depends on their lateral extension. This result can be explained by the theory of the potential pinch-off effect in inhomogeneous MS contacts.

  5. Scattering mechanisms in a high-mobility low-density carbon-doped (100) GaAs two-dimensional hole system

    NASA Astrophysics Data System (ADS)

    Watson, J. D.; Mondal, S.; Csáthy, G. A.; Manfra, M. J.; Hwang, E. H.; Das Sarma, S.; Pfeiffer, L. N.; West, K. W.

    2011-06-01

    We report on a systematic study of the density dependence of mobility in a low-density carbon-doped (100) GaAs two-dimensional hole system (2DHS). At T=50 mK, a mobility of 2.6 × 106 cm2/Vs at a density p=6.2×1010 cm-2 was measured. This is the highest mobility reported for a 2DHS to date. Using a backgated sample geometry, the density dependence of mobility was studied from 2.8 × 1010 cm-2 to 1 × 1011 cm-2. The mobility vs density cannot be fit to a power law dependence of the form μ~pα using a single exponent α. Our data indicate a continuous evolution of the power law with α ranging from ~0.7 at high density and increasing to ~1.7 at the lowest densities measured. Calculations specific to our structure indicate a crossover of the dominant scattering mechanism from uniform background impurity scattering at high density to remote ionized impurity scattering at low densities. This is the first observation of a carrier density-induced transition from background impurity dominated to remote dopant dominated transport in a single sample.

  6. The effects of the magnitude of the modulation field on electroreflectance spectroscopy of undoped-n+ type doped GaAs

    NASA Astrophysics Data System (ADS)

    Wang, D. P.; Huang, K. M.; Shen, T. L.; Huang, K. F.; Huang, T. C.

    1998-01-01

    The electroreflectance (ER) spectra of an undoped-n+ type doped GaAs has been measured at various amplitudes of modulating fields (δF). Many Franz-Keldysh oscillations were observed above the band gap energy, thus enabling the electric field (F) in the undoped layer to be determined. The F is obtained by applying fast Fourier transformation to the ER spectra. When δF is small, the power spectrum can be clearly resolved into two peaks, which corresponds to heavy- and light-hole transitions. When δF is less than ˜1/8 of the built-in field (Fbi˜77 420 V/cm), the F deduced from the ER is almost independent of δF. However, when larger than this, F is increased with δF. Also, when δF is increased to larger than ˜1/8 of Fbi, a shoulder appears on the right side of the heavy-hole peak of the power spectrum. The separation between the main peak and the shoulder of the heavy-hole peak becomes wider as δF becomes larger.

  7. Carbon-doped high-mobility hole gases on (0 0 1) and (1 1 0) GaAs

    NASA Astrophysics Data System (ADS)

    Gerl, C.; Schmult, S.; Wurstbauer, U.; Tranitz, H.-P.; Mitzkus, C.; Wegscheider, W.

    2006-05-01

    Since Stormer and Tsang have introduced the first two-dimensional hole gas (2DHG) in the GaAs/AlGaAs heterosystem, the choice of suitable dopants was limited to beryllium and silicon over the last 20 years. Both acceptor atoms have significant disadvantages, i.e. either high-diffusion rates or a limitation to specific growth directions. Utilizing a carbon filament-doping source, we prepared high-quality 2DHGs in the (0 0 1) and the nonpolar (1 1 0) crystal plane with carrier mobilies beyond 10 6 cm 2/Vs in quantum well and single interface structures. Low-temperature magnetoresistance measurements recover a large number of fractional QHE states and show a pronounced beating pattern from which the Rashba induced spin-splitting has been determined. In addition, 2DHGs have been grown on cleaved edges of (1 1 0) and (0 0 1) wafers with transport features in qualitative agreement to our findings on (1 1 0) substrates.

  8. Coherent dynamics of Landau-Levels in modulation doped GaAs quantum wells at high magnetic fields

    NASA Astrophysics Data System (ADS)

    Liu, Cunming; Paul, Jagannath; Reno, John; McGill, Stephen; Hilton, David; Karaiskaj, Denis

    By using two-dimensional Fourier transform spectroscopy, we investigate the dynamics of Landau-Levels formed in modulation doped GaAs/AlGaAs quantum wells of 18 nm thickness at high magnetic fields and low temperature. The measurements show interesting dephasing dynamics and linewidth dependency as a function of the magnetic field. The work at USF and UAB was supported by the National Science Foundation under grant number DMR-1409473. The work at NHMFL, FSU was supported by the National Science Foundation under grant numbers DMR-1157490 and DMR-1229217. This work was performed, in part, at the Center for Integrated Nanotechnologies, a U.S. Department of Energy, Office of Basic Energy Sciences user facility. Sandia National Laboratories is a multi-program laboratory managed and operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin Corporation, for the U.S. Department of Energy's National Nuclear Security Administration under Contract No. DE-AC04-94AL85000.

  9. Numerical study of metal oxide Schottky type solar cells

    NASA Astrophysics Data System (ADS)

    Zhu, L.; Shao, G.; Luo, J. K.

    2012-07-01

    Metal oxide (MO) semiconductors hold the promise for the development of high efficiency solar cells with low cost. Currently heterostructure type MO solar cells have been theoretically and experimentally studied, demonstrated their potential for applications. This paper highlights a numerical investigation on Schottky type MO solar cells using CuO as the absorption layer. It is shown that the doping concentration, absorption layer thickness, barrier height and back surface field have significant effects on the performance of the devices. Under the optimal structure and doping, the Schottky barrier solar cells, if can be fabricated with suitable techniques, can have a conversion efficiency up to 18.5%, comparable to MO heterojunction solar cells, but at a much simpler structure and lower cost. Some guidelines about the materials selection and structure design for MO Schottky barrier solar cells are summarized.

  10. Growth and characterization of metamorphic InxGa1-xAs/InAlAs (x >= 0.8) modulation doped heterostructures on GaAs using a linearly graded In(AlGa)as buffer layer

    NASA Astrophysics Data System (ADS)

    Wang, S. M.; Karlsson, C.; Rorsman, N.; Bergh, M.; Olsson, E.; Andersson, T. G.

    1997-01-01

    Metamorphic InxGa1-xAs/InAlAs (x >= 0.8) modulation doped heterostructures have been grown on GaAs using a linearly graded In(AlGa)As buffer layer, and their structural and electric properties have been investigated. Surface morphology was found to depend on growth temperature and graded buffer thickness. Low growth temperature resulted in a relatively smooth surface with a minimum root-mean-square roughness value of 4-7 nm. The In(AlGa)As graded buffer effectively prevented dislocations from threading into the top layers. The epilayer grown on the graded buffer was tilted and not fully relaxed. High electron mobility and sheet density were achieved. The highest mobility value was 13740 cm2/Vs with a carrier density of 1.9 · 1012 cm-2 at 300 K. These values are comparable with InP-based InGaAs/InAlAs modulation doped heterostructures.

  11. Photonic crystal cavities with metallic Schottky contacts

    SciTech Connect

    Quiring, W.; Al-Hmoud, M.; Reuter, D.; Zrenner, A.; Rai, A.; Wieck, A. D.

    2015-07-27

    We report about the fabrication and analysis of high Q photonic crystal cavities with metallic Schottky-contacts. The structures are based on GaAs n-i membranes with an InGaAs quantum well in the i-region and nanostructured low ohmic metal top-gates. They are designed for photocurrent readout within the cavity and fast electric manipulations. The cavity structures are characterized by photoluminescence and photocurrent spectroscopy under resonant excitation. We find strong cavity resonances in the photocurrent spectra and surprisingly high Q-factors up to 6500. Temperature dependent photocurrent measurements in the region between 4.5 K and 310 K show an exponential enhancement of the photocurrent signal and an external quantum efficiency up to 0.26.

  12. An AFM-based surface oxidation process for heavily carbon-doped p-type GaAs with a hole concentration of 1.5×1021 cm-3

    NASA Astrophysics Data System (ADS)

    Shirakashi, J.-I.; Matsumoto, K.; Konagai, M.

    Under appropriate bias conditions in ambient humidity, AFM can be used to selectively oxidize the surface of electronic materials such as metals and semiconductors. Therefore, an AFM-based surface modification technique would be a powerful tool for fabricating nanometer-sized metal (M)/insulator (I) or semiconductor (S)/insulator (I) junction structures. Heavily carbon-doped p-type GaAs with a hole concentration of 1.5×1021 cm-3 is also of great interest for application to novel device structures, because the carrier concentration is comparable to that of normal metals. Selective surface oxidation of carbon-doped p-type GaAs was achieved using a negatively biased conductive tip. The oxidation shown here was carried out under 20-25% ambient humidity. By changing the applied bias voltage and the scanning speed of the cantilever, the size of the modified structure wires was precisely controlled, with a feature size of 10 nm. These results suggest that GaAs-based devices with ultra-small SIS junction systems could be realized using the AFM-based surface oxidation process.

  13. Study of microdefects and their distribution in dislocation-free Si-doped HB GaAs by X-ray diffuse scattering on triple-crystal diffractometer

    NASA Astrophysics Data System (ADS)

    Charniy, L. A.; Morozov, A. N.; Bublik, V. T.; Scherbachev, K. D.; Stepantsova, I. V.; Kaganer, V. M.

    1992-03-01

    Microdefects in dislocation-free Si-doped (n = (1-3) × 10 18cm-3) HB GaAs crystals were studied by X-ray diffuse scattering measured with the help of a triple-crystal diffractometer. The intensity of the diffuse scattering as well as the isointensity contours around different reciprocal lattice points were analysed. A comparison of the measured isointensity contours with the theoretically calculated ones showed that the microdefects detected are interstitial dislocation loops with the Burgers vectors b = {1}/{2}<110 #3862;; lying in the planes #38;{110} and {111}. The mean radius of the dislocation loops R0 was determined using the wave vector q0 alpha; R-10 corresponding to the transmition point where the Huang diffuse scattering I( q) alpha q-2 ( q < q0) changed to the asymptotic scattering I( q) alpha q-4 ( q #62 q0). The analysis of a D-shaped cross-sectional (111) wafer cut from the end part of the HB ingot showed that R0 changed smoothly along the [ overline211] symmetry axis of the wafer. The highly inhomogeneous "new-moon"-like distribution of the non-dislocational etch-pits was also obtained. The maximal loop radius obtained at the edges of the wafer, R 0 = 1 μm, corresponds to the wafer area enriched with etch-pits and the minimal one, R 0 = 0.3 μm, corresponds to the bound of the new-moon-like area denuded from etch-pits. Microdefects of a new type were detected in the denuded area. These microdefects consist of nuclei, 0.1 μm in radius, and an extended atmosphere of interstitials. The minimal microdefect radius in the centre of the wafer corresponds to the maximum local value of the lattice parameter a = 5.655380 Å, and the minimum local value a = 5.65372 Å was obtained at the wafer edges enriched with microdefect-related etch-pits. Absolute X-ray diffuse intensity measurements were used for microdefect concentration determination. Normalization of I( q) was based on the comparison of the Huang intensity with the thermal diffuse scattering

  14. Nickel-gallium arsenide high-voltage power Schottky diodes

    NASA Astrophysics Data System (ADS)

    Ashkinazi, G.; Hadas, Tz.; Meyler, B.; Nathan, M.; Zolotarevski, L.; Zolotarevski, O.

    1993-01-01

    A power GaAs Schottky diode (SD) with a chemically deposited Ni barrier was designed, fabricated and tested. The diode has a reverse breakdown voltage VBR of 140 V, forward voltage drop VF (at 50 A/cm 2) of 0.7 V at 23°C, 0.5 V at 150°C and 0.3 V at 250°C, and reverse leakage current densities jR (at -50 V) of 0.1 μA/cm 2 at 23°C and 1 mA/cm 2 at 150°C. Calculated forward and reverse I- V characteristics using a simple self-consistent computer model are in good agreement with measured values. Calculated characteristics of a silicon SD with identical structure parameters, using the same model, show much poorer VBR, VF and jR values. The theoretical maximum value of VBR is physically limited by the largest allowed VF. For a V Fof ⋍1.6 V, V BR.maxis ⋍200 V in Si and ⋍800 simple technology allows manufacturing of large area GaAs Schottky diodes with average currents up to V in GaAs SDs. Our relatively 100 A.

  15. High efficiency thin-film GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Stirn, R. J.

    1977-01-01

    Several oxidation techniques are discussed which have been found to increase the open circuit (V sub oc) of metal-GaAs Schottky barrier solar cells, the oxide chemistry, attempts to measure surface state parameters, the evolving characteristics of the solar cell as background contamination (has been decreased, but not eliminated), results of focused Nd/YAG laser beam recrystallization of Ge films evaporated onto tungsten, and studies of AMOS solar cells fabricated on sliced polycrystalline GaAs wafers. Also discussed are projected materials availability and costs for GaAs thin-film solar cells.

  16. InGaAs/InP heteroepitaxial Schottky barrier diodes for terahertz applications

    NASA Technical Reports Server (NTRS)

    Bhapkar, Udayan V.; Li, Yongjun; Mattauch, Robert J.

    1992-01-01

    This paper explores the feasibility of planar, sub-harmonically pumped, anti-parallel InGaAs/InP heteroepitaxial Schottky diodes for terahertz applications. We present calculations of the (I-V) characteristics of such diodes using a numerical model that considers tunneling. We also present noise and conversion loss predictions of diode mixers operated at 500 GHz, and obtained from a multi-port mixer analysis, using the I-V characteristics predicted by our model. Our calculations indicate that InGaAs/InP heteroepitaxial Schottky barrier diodes are expected to have an I-V characteristic with an ideality factor comparable to that of GaAs Schottky diodes. However, the reverse saturation current of InGaAs/InP diodes is expected to be much greater than that of GaAs diodes. These predictions are confirmed by experiment. The mixer analyses predict that sub-harmonically pumped anti-parallel InGaAs/InP diode mixers are expected to offer a 2 dB greater conversion loss and a somewhat higher single sideband noise temperature than their GaAs counterparts. More importantly, the InGaAs/InP devices are predicted to require only one-tenth of the local oscillator power required by similar GaAs diodes.

  17. Characterization by Internal Photoemission Spectroscopy of Single-Crystal CVD Diamond Schottky Barrier Diodes

    NASA Astrophysics Data System (ADS)

    Majdi, Saman; Gabrysch, Markus; Balmer, Richard; Twitchen, Daniel; Isberg, Jan

    2010-08-01

    Internal photoemission spectroscopy measurements have been performed to study the electrical characteristics of Schottky diodes on boron-doped single-crystalline chemical vapor deposited (SC-CVD) diamond. These measurements were compared with current-voltage ( I- V) and current-temperature ( I- T) measurements. Schottky contact barrier heights and ideality factors have been measured on Schottky contacts formed on four samples with Au, Ni, and Al contact metallizations. I- V and I- T measurements were performed in the temperature range from 300 K to 500 K. The internal photoemission method, which is less influenced by local variations in the Schottky barrier height than the other two methods, yielded the highest values of Schottky barrier heights to p-type material: ΦB = 1.78 eV to 2.10 eV, depending on the choice of contact metal and sample boron concentration.

  18. Schottky barrier formation and band bending revealed by first- principles calculations

    PubMed Central

    Jiao, Yang; Hellman, Anders; Fang, Yurui; Gao, Shiwu; Käll, Mikael

    2015-01-01

    The formation of a Schottky barrier at the metal-semiconductor interface is widely utilised in semiconductor devices. With the emerging of novel Schottky barrier based nanoelectronics, a further microscopic understanding of this interface is in high demand. Here we provide an atomistic insight into potential barrier formation and band bending by ab initio simulations and model analysis of a prototype Schottky diode, i.e., niobium doped rutile titania in contact with gold (Au/Nb:TiO2). The local Schottky barrier height is found to vary between 0 and 1.26 eV depending on the position of the dopant. The band bending is caused by a dopant induced dipole field between the interface and the dopant site, whereas the pristine Au/TiO2 interface does not show any band bending. These findings open the possibility for atomic scale optimisation of the Schottky barrier and light harvesting in metal-semiconductor nanostructures. PMID:26065401

  19. Schottky barrier formation and band bending revealed by first- principles calculations

    NASA Astrophysics Data System (ADS)

    Jiao, Yang; Hellman, Anders; Fang, Yurui; Gao, Shiwu; Käll, Mikael

    2015-06-01

    The formation of a Schottky barrier at the metal-semiconductor interface is widely utilised in semiconductor devices. With the emerging of novel Schottky barrier based nanoelectronics, a further microscopic understanding of this interface is in high demand. Here we provide an atomistic insight into potential barrier formation and band bending by ab initio simulations and model analysis of a prototype Schottky diode, i.e., niobium doped rutile titania in contact with gold (Au/Nb:TiO2). The local Schottky barrier height is found to vary between 0 and 1.26 eV depending on the position of the dopant. The band bending is caused by a dopant induced dipole field between the interface and the dopant site, whereas the pristine Au/TiO2 interface does not show any band bending. These findings open the possibility for atomic scale optimisation of the Schottky barrier and light harvesting in metal-semiconductor nanostructures.

  20. Schottky barrier formation and band bending revealed by first- principles calculations.

    PubMed

    Jiao, Yang; Hellman, Anders; Fang, Yurui; Gao, Shiwu; Käll, Mikael

    2015-01-01

    The formation of a Schottky barrier at the metal-semiconductor interface is widely utilised in semiconductor devices. With the emerging of novel Schottky barrier based nanoelectronics, a further microscopic understanding of this interface is in high demand. Here we provide an atomistic insight into potential barrier formation and band bending by ab initio simulations and model analysis of a prototype Schottky diode, i.e., niobium doped rutile titania in contact with gold (Au/Nb:TiO2). The local Schottky barrier height is found to vary between 0 and 1.26 eV depending on the position of the dopant. The band bending is caused by a dopant induced dipole field between the interface and the dopant site, whereas the pristine Au/TiO2 interface does not show any band bending. These findings open the possibility for atomic scale optimisation of the Schottky barrier and light harvesting in metal-semiconductor nanostructures. PMID:26065401

  1. LEC GaAs for integrated circuit applications

    NASA Technical Reports Server (NTRS)

    Kirkpatrick, C. G.; Chen, R. T.; Homes, D. E.; Asbeck, P. M.; Elliott, K. R.; Fairman, R. D.; Oliver, J. D.

    1984-01-01

    Recent developments in liquid encapsulated Czochralski techniques for the growth of semiinsulating GaAs for integrated circuit applications have resulted in significant improvements in the quality and quantity of GaAs material suitable for device processing. The emergence of high performance GaAs integrated circuit technologies has accelerated the demand for high quality, large diameter semiinsulating GaAs substrates. The new device technologies, including digital integrated circuits, monolithic microwave integrated circuits and charge coupled devices have largely adopted direct ion implantation for the formation of doped layers. Ion implantation lends itself to good uniformity and reproducibility, high yield and low cost; however, this technique also places stringent demands on the quality of the semiinsulating GaAs substrates. Although significant progress was made in developing a viable planar ion implantation technology, the variability and poor quality of GaAs substrates have hindered progress in process development.

  2. Cryogenic operation of GaAs based multiplier chains to 400 GHz

    NASA Technical Reports Server (NTRS)

    Maestrini, A.; Pukala, D.; Maiwald, F.; Schlecht, E.; Chattopadhyay, G.; Mehdi, I.

    2000-01-01

    The FIRST/HIFI mission allows for the local oscillator frequency multiplier chains to be cooled to 120 - 150 K in order to increase available output power. This paper will discuss the implication of cooling on GaAs based planar Schottky diode varactors for flight applications.

  3. Graphene/silicon nanowire Schottky junction for enhanced light harvesting.

    PubMed

    Fan, Guifeng; Zhu, Hongwei; Wang, Kunlin; Wei, Jinquan; Li, Xinming; Shu, Qinke; Guo, Ning; Wu, Dehai

    2011-03-01

    Schottky junction solar cells are assembled by directly coating graphene films on n-type silicon nanowire (SiNW) arrays. The graphene/SiNW junction shows enhanced light trapping and faster carrier transport compared to the graphene/planar Si structure. With chemical doping, the SiNW-based solar cells showed energy conversion efficiencies of up to 2.86% at AM1.5 condition, opening a possibility of using graphene/semiconductor nanostructures in photovoltaic application. PMID:21323376

  4. An integrated membrane sub-harmonic Schottky diode mixers at 340GHz

    NASA Astrophysics Data System (ADS)

    Wang, Junlong; Yang, Dabao; Xing, Dong; Liang, Shixiong; Zhang, Lisen; Zhao, Xiangyang; Feng, Zhihong

    2015-11-01

    This paper presents a sub-harmonic mixer operating over the spectral band 332-348 GHz. The mixers employ integrated GaAs membrane Schottky diode technology. The simulated results show that the conversion loss of the mixer is below dB in the band from 333 GHz to 347 GHz with a local oscillator power requirement of 5mW.The minimum is 8.2dB at 344GHz.

  5. Analysis and modelling of GaN Schottky-based circuits at millimeter wavelengths

    NASA Astrophysics Data System (ADS)

    Pardo, D.; Grajal, J.

    2015-11-01

    This work presents an analysis of the capabilities of GaN Schottky diodes for frequency multipliers and mixers at millimeter wavelengths. By using a Monte Carlo (MC) model of the diode coupled to a harmonic balance technique, the electrical and noise performances of these circuits are investigated. Despite the lower electron mobility of GaN compared to GaAs, multipliers based on GaN Schottky diodes can be competitive in the first stages of multiplier chains, due to the excellent power handling capabilities of this material. The performance of these circuits can be improved by taking advantage of the lateral Schottky diode structures based on AlGaN/GaN HEMT technology.

  6. Effects of ultrathin oxides in conducting MIS structures on GaAs

    NASA Technical Reports Server (NTRS)

    Childs, R. B.; Ruths, J. M.; Sullivan, T. E.; Fonash, S. J.

    1978-01-01

    Schottky barrier-type GaAs baseline devices (semiconductor surface etched and then immediately metalized) and GaAs conducting metal oxide-semiconductor devices are fabricated and characterized. The baseline surfaces (no purposeful oxide) are prepared by a basic or an acidic etch, while the surface for the MIS devices are prepared by oxidizing after the etch step. The metallizations used are thin-film Au, Ag, Pd, and Al. It is shown that the introduction of purposeful oxide into these Schottky barrier-type structures examined on n-type GaAs modifies the barrier formation, and that thin interfacial layers can modify barrier formation through trapping and perhaps chemical reactions. For Au- and Pd-devices, enhanced photovoltaic performance of the MIS configuration is due to increased barrier height.

  7. Whiskerless Schottky diode

    NASA Technical Reports Server (NTRS)

    Bishop, William L. (Inventor); Mcleod, Kathleen A. (Inventor); Mattauch, Robert J. (Inventor)

    1991-01-01

    A Schottky diode for millimeter and submillimeter wave applications is comprised of a multi-layered structure including active layers of gallium arsenide on a semi-insulating gallium arsenide substrate with first and second insulating layers of silicon dioxide on the active layers of gallium arsenide. An ohmic contact pad lays on the silicon dioxide layers. An anode is formed in a window which is in and through the silicon dioxide layers. An elongated contact finger extends from the pad to the anode and a trench, preferably a transverse channel or trench of predetermined width, is formed in the active layers of the diode structure under the contact finger. The channel extends through the active layers to or substantially to the interface of the semi-insulating gallium arsenide substrate and the adjacent gallium arsenide layer which constitutes a buffer layer. Such a structure minimizes the effect of the major source of shunt capacitance by interrupting the current path between the conductive layers beneath the anode contact pad and the ohmic contact. Other embodiments of the diode may substitute various insulating or semi-insulating materials for the silicon dioxide, various semi-conductors for the active layers of gallium arsenide, and other materials for the substrate, which may be insulating or semi-insulating.

  8. Carbon-Nanotube Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Manohara, Harish; Wong, Eric; Schlecht, Erich; Hunt, Brian; Siegel, Peter

    2006-01-01

    Schottky diodes based on semiconducting single-walled carbon nanotubes are being developed as essential components of the next generation of submillimeter-wave sensors and sources. Initial performance predictions have shown that the performance characteristics of these devices can exceed those of the state-of-the-art solid-state Schottky diodes that have been the components of choice for room-temperature submillimeter-wave sensors for more than 50 years. For state-of-the-art Schottky diodes used as detectors at frequencies above a few hundred gigahertz, the inherent parasitic capacitances associated with their semiconductor junction areas and the resistances associated with low electron mobilities limit achievable sensitivity. The performance of such a detector falls off approximately exponentially with frequency above 500 GHz. Moreover, when used as frequency multipliers for generating signals, state-of-the-art solid-state Schottky diodes exhibit extremely low efficiencies, generally putting out only micro-watts of power at frequencies up to 1.5 THz. The shortcomings of the state-of-the-art solid-state Schottky diodes can be overcome by exploiting the unique electronic properties of semiconducting carbon nanotubes. A single-walled carbon nanotube can be metallic or semiconducting, depending on its chirality, and exhibits high electron mobility (recently reported to be approx.= 2x10(exp 5)sq cm/V-s) and low parasitic capacitance. Because of the narrowness of nanotubes, Schottky diodes based on carbon nanotubes have ultra-small junction areas (of the order of a few square nanometers) and consequent junction capacitances of the order of 10(exp -18) F, which translates to cutoff frequency >5 THz. Because the turn-on power levels of these devices are very low (of the order of nano-watts), the input power levels needed for pumping local oscillators containing these devices should be lower than those needed for local oscillators containing state-of-the-art solid

  9. Effect of Split Gate Size on the Electrostatic Potential and 0.7 Anomaly within Quantum Wires on a Modulation-Doped GaAs /AlGaAs Heterostructure

    NASA Astrophysics Data System (ADS)

    Smith, L. W.; Al-Taie, H.; Lesage, A. A. J.; Thomas, K. J.; Sfigakis, F.; See, P.; Griffiths, J. P.; Farrer, I.; Jones, G. A. C.; Ritchie, D. A.; Kelly, M. J.; Smith, C. G.

    2016-04-01

    We study 95 split gates of different size on a single chip using a multiplexing technique. Each split gate defines a one-dimensional channel on a modulation-doped GaAs /AlGaAs heterostructure, through which the conductance is quantized. The yield of devices showing good quantization decreases rapidly as the length of the split gates increases. However, for the subset of devices showing good quantization, there is no correlation between the electrostatic length of the one-dimensional channel (estimated using a saddle-point model) and the gate length. The variation in electrostatic length and the one-dimensional subband spacing for devices of the same gate length exceeds the variation in the average values between devices of different lengths. There is a clear correlation between the curvature of the potential barrier in the transport direction and the strength of the "0.7 anomaly": the conductance value of the 0.7 anomaly reduces as the barrier curvature becomes shallower. These results highlight the key role of the electrostatic environment in one-dimensional systems. Even in devices with clean conductance plateaus, random fluctuations in the background potential are crucial in determining the potential landscape in the active device area such that nominally identical gate structures have different characteristics.

  10. Photoluminescence properties of modulation-doped In{sub x}Al{sub 1–x}As/In{sub y}Ga{sub 1–y}As/In{sub x}Al{sub 1–x}As structures with strained inas and gaas nanoinserts in the quantum well

    SciTech Connect

    Galiev, G. B.; Vasil’evskii, I. S.; Klimov, E. A.; Klochkov, A. N.; Lavruhin, D. V.; Pushkarev, S. S.; Maltsev, P. P.

    2015-09-15

    The photoluminescence spectra of modulation-doped InAlAs/InGaAs/InAlAs heterostructures with quantum wells containing thin strained InAs and GaAs inserts are investigated. It is established that the insertion of pair InAs layers and/ or a GaAs transition barriers with a thickness of 1 nm into a quantum well leads to a change in the form and energy position of the photoluminescence spectra as compared with a uniform In{sub 0.53}Ga{sub 0.47}As quantum well. Simulation of the band structure shows that this change is caused by a variation in the energy and wave functions of holes. It is demonstrated that the use of InAs inserts leads to the localization of heavy holes near the InAs layers and reduces the energy of optical transitions, while the use of GaAs transition barriers can lead to inversion of the positions of the light- and heavy-hole subbands in the quantum well. A technique for separately controlling the light- and heavy-hole states by varying the thickness and position of the GaAs and InAs inserts in the quantum well is suggested.

  11. Temperature dependent simulation of diamond depleted Schottky PIN diodes

    NASA Astrophysics Data System (ADS)

    Hathwar, Raghuraj; Dutta, Maitreya; Koeck, Franz A. M.; Nemanich, Robert J.; Chowdhury, Srabanti; Goodnick, Stephen M.

    2016-06-01

    Diamond is considered as an ideal material for high field and high power devices due to its high breakdown field, high lightly doped carrier mobility, and high thermal conductivity. The modeling and simulation of diamond devices are therefore important to predict the performances of diamond based devices. In this context, we use Silvaco® Atlas, a drift-diffusion based commercial software, to model diamond based power devices. The models used in Atlas were modified to account for both variable range and nearest neighbor hopping transport in the impurity bands associated with high activation energies for boron doped and phosphorus doped diamond. The models were fit to experimentally reported resistivity data over a wide range of doping concentrations and temperatures. We compare to recent data on depleted diamond Schottky PIN diodes demonstrating low turn-on voltages and high reverse breakdown voltages, which could be useful for high power rectifying applications due to the low turn-on voltage enabling high forward current densities. Three dimensional simulations of the depleted Schottky PIN diamond devices were performed and the results are verified with experimental data at different operating temperatures

  12. Isoelectronic co-doping

    DOEpatents

    Mascarenhas, Angelo

    2004-11-09

    Isoelectronic co-doping of semiconductor compounds and alloys with deep acceptors and deep donors is used to decrease bandgap, to increase concentration of the dopant constituents in the resulting alloys, and to increase carrier mobilities lifetimes. Group III-V compounds and alloys, such as GaAs and GaP, are isoelectronically co-doped with, for example, N and Bi, to customize solar cells, thermal voltaic cells, light emitting diodes, photodetectors, and lasers on GaP, InP, GaAs, Ge, and Si substrates. Isoelectronically co-doped Group II-VI compounds and alloys are also included.

  13. Plastic Schottky barrier solar cells

    DOEpatents

    Waldrop, James R.; Cohen, Marshall J.

    1984-01-24

    A photovoltaic cell structure is fabricated from an active medium including an undoped, intrinsically p-type organic semiconductor comprising polyacetylene. When a film of such material is in rectifying contact with a magnesium electrode, a Schottky-barrier junction is obtained within the body of the cell structure. Also, a gold overlayer passivates the magnesium layer on the undoped polyacetylene film.

  14. The Tevatron resonant Schottky detectors

    SciTech Connect

    Marriner, John; /Fermilab

    1995-09-01

    The following is a description of some studies the author made on the resonant Schottky detectors in the Tevatron. The author doubts that this document contains any information that wasn't known previously, but the hope is that this document will serve as a useful self-contained reference for users of the system.

  15. 670-GHz Schottky Diode-Based Subharmonic Mixer with CPW Circuits and 70-GHz IF

    NASA Technical Reports Server (NTRS)

    Chattopadhyay, Goutam; Schlecht, Erich T.; Lee, Choonsup; Lin, Robert H.; Gill, John J.; Mehdi, Imran; Sin, Seth; Deal, William; Loi, Kwok K.; Nam, Peta; Rodriguez, Bryan

    2012-01-01

    GaAs-based, sub-harmonically pumped Schottky diode mixers offer a number of advantages for array implementation in a heterodyne receiver system. Since the radio frequency (RF) and local oscillator (LO) signals are far apart, system design becomes much simpler. A proprietary planar GaAs Schottky diode process was developed that results in very low parasitic anodes that have cutoff frequencies in the tens of terahertz. This technology enables robust implementation of monolithic mixer and frequency multiplier circuits well into the terahertz frequency range. Using optical and e-beam lithography, and conventional epitaxial layer design with innovative usage of GaAs membranes and metal beam leads, high-performance terahertz circuits can be designed with high fidelity. All of these mixers use metal waveguide structures for housing. Metal machined structures for RF and LO coupling hamper these mixers to be integrated in multi-pixel heterodyne array receivers for spectroscopic and imaging applications. Moreover, the recent developments of terahertz transistors on InP substrate provide an opportunity, for the first time, to have integrated amplifiers followed by Schottky diode mixers in a heterodyne receiver at these frequencies. Since the amplifiers are developed on a planar architecture to facilitate multi-pixel array implementation, it is quite important to find alternative architecture to waveguide-based mixers.

  16. Sulfidic photochemical passivation of GaAs surfaces in alcoholic solutions

    SciTech Connect

    Simonsmeier, T.; Ivankov, A.; Bauhofer, W.

    2005-04-15

    We report on a remarkable enhancement of the passivation effect of sulfidic solutions through illumination with above band gap light. Luminescence measurements on GaAs surfaces which have been illuminated during chemical passivation reveal in comparison to nonilluminated samples a further reduction of their surface density of states as well as a significantly increased stability of the passivation. Investigations with photoelectron spectroscopy show that illumination leads to a nearly complete removal of oxides on the surface. Measurements on Schottky diodes which have been manufactured with photochemically passivated GaAs indicate a noticeable decrease in band bending and a depinning of the Fermi level.

  17. Electronic structure computation and differential capacitance profile in δ-doped FET as a function of hydrostatic pressure

    SciTech Connect

    Carlos-Pinedo, C.; Rodríguez-Vargas, I.; Martínez-Orozco, J. C.

    2014-05-15

    In this work we present the results obtained from the calculation of the level structure of a n-type delta-doped well Field Effect Transistor when is subjected to hydrostatic pressure. We study the energy level structure as a function of hydrostatic pressure within the range of 0 to 6 kbar for different Schottky barrier height (SBH). We use an analytical expression for the effect of hydrostatic pressure on the SBH and the pressure dependence of the basic parameters of the system as the effective mass m(P) and the dielectric constant ε(P) of GaAs. We found that due to the effects of hydrostatic pressure, in addition to electronic level structure alteration, the profile of the differential capacitance per unit area C{sup −2} is affected.

  18. On the ohmicity of Schottky contacts

    NASA Astrophysics Data System (ADS)

    Sachenko, A. V.; Belyaev, A. E.; Konakova, R. V.

    2016-06-01

    An analysis is made of the conditions for ohmic contacts realization in the case of Schottky contacts. Based on the classical notions about the mechanisms of current flow, we consider the generalized model of Schottky contact that takes into account the thermionic current of majority charge carriers and recombination current of minority charge carriers in Schottky contacts with a dielectric gap. An analysis of the results given by that model made it possible to obtain ohmicity criteria for Schottky contacts and compare the conditions for low injection level and ohmicity of Schottky contacts in the case of silicon-based contacts. It is shown that conditions for Schottky contact ohmicity do not coincide with those for p-n junctions.

  19. InP and GaAs characterization with variable stoichiometry obtained by molecular spray

    NASA Technical Reports Server (NTRS)

    Massies, J.; Linh, N. T.; Olivier, J.; Faulconnier, P.; Poirier, R.

    1979-01-01

    Both InP and GaAs surfaces were studied in parallel. A molecular spray technique was used to obtain two semiconductor surfaces with different superficial compositions. The structures of these surfaces were examined by electron diffraction. Electron energy loss was measured spectroscopically in order to determine surface electrical characteristics. The results are used to support conclusions relative to the role of surface composition in establishing a Schottky barrier effect in semiconductor devices.

  20. Organic Schottky diode: Characterization of traps

    NASA Astrophysics Data System (ADS)

    Rani, Varsha; Yadav, Sarita; Ghosh, Subhasis

    2015-06-01

    We have demonstrated the formation and characterization of Schottky junction in metal/organic/metal sandwiched devices based on organic molecular semiconductors, using current-voltage (J-V) and capacitance-voltage (C-V) characteristics, in particular how traps affect the device performance. Ideality factor of organic Schottky diode is always greater than unity and increases with decreasing the temperature. Diffusion coefficient has been determined from current density -voltage characteristic in Schottky diodes.

  1. Ferroelectric Schottky barrier tunnel FET with gate-drain underlap: Proposal and investigation

    NASA Astrophysics Data System (ADS)

    Kale, Sumit; Kondekar, P. N.

    2016-01-01

    In this paper, for the first time, a novel ferroelectric schottky barrier tunnel FET (Fe SB-TFET) is proposed and investigated. The Fe SB-TFET consists of ferroelectric gate stack with highly doped pocket at the source/drain and channel interface. In addition, for the suppression of ambipolar leakage current (IAMB), gate-drain underlap is employed. By using ferroelectric gate stack, we effectively amplified the applied gate voltage to enhance electric field for the reduction of tunneling barrier width at the source side schottky barrier. As a result, the increased tunneling probability improves the device performance in terms of high ION, high ION/IOFF ratio, reduced IAMB and low subthreshold swing (SS) as compared to the conventional SB-TFET having double pocket. We also investigate the influence of highly doped pocket (HDP) doping concentration and length on the device performance.

  2. New approach to the design of Schottky barrier diodes for THz mixers

    NASA Technical Reports Server (NTRS)

    Jelenski, A.; Grueb, A.; Krozer, V.; Hartnagel, H. L.

    1992-01-01

    Near-ideal GaAs Schottky barrier diodes especially designed for mixing applications in the THz frequency range are presented. A diode fabrication process for submicron diodes with near-ideal electrical and noise characteristics is described. This process is based on the electrolytic pulse etching of GaAs in combination with an in-situ platinum plating for the formation of the Schottky contacts. Schottky barrier diodes with a diameter of 1 micron fabricated by the process have already shown excellent results in a 650 GHz waveguide mixer at room temperature. A conversion loss of 7.5 dB and a mixer noise temperature of less than 2000 K have been obtained at an intermediate frequency of 4 GHz. The optimization of the diode structure and the technology was possible due to the development of a generalized Schottky barrier diode model which is valid also at high current densities. The common diode design and optimization is discussed on the basis of the classical theory. However, the conventional fomulas are valid only in a limited forward bias range corresponding to currents much smaller than the operating currents under submillimeter mixing conditions. The generalized new model takes into account not only the phenomena occurring at the junction such as current dependent recombination and drift/diffusion velocities, but also mobility and electron temperature variations in the undepleted epi-layer. Calculated diode I/V and noise characteristics are in excellent agreement with the measured values. Thus, the model offers the possibility of optimizing the diode structure and predicting the diode performance under mixing conditions at THz frequencies.

  3. High purity liquid phase epitaxial GaAs for radiation detectors

    SciTech Connect

    Wynne, D.I.; Haller, E.E.; Rossington Tull, C.S.

    1998-12-31

    The authors report on the growth of high purity n-GaAs using Liquid Phase Epitaxy (LPE) and the fabrication of room temperature p-i-n radiation detectors. The epilayers are grown from a Ga solvent in a graphite boat in a pure hydrogen atmosphere. Growth is started at a temperature of approximately 800 C. The best epilayers show a net-residual-donor concentration of 2 {times} 10{sup 13} cm{sup {minus}3}, confirmed by Hall effect measurements. The residual donors have been analyzed by far infrared spectroscopy and found to be sulfur and silicon. Epilayers with thicknesses of up to 120 {micro}m have been deposited on 650 {micro}m thick semi-insulating GaAs substrates and on 500 {micro}m thick n{sup +}-type GaAs substrates. The authors report the results obtained with Schottky barrier diodes fabricated from these high purity n-type GaAs epilayers and operated as X-ray detectors. The Schottky barrier contacts consisted of evaporated circular gold contacts on epilayers on n{sup +} substrates. The ohmic contacts were formed by evaporated and alloyed Ni-Ge-Au films on the back of the substrate. Several of the diodes exhibit currents of the order of 1 to 10 nA at reverse biases depleting approximately 50 {micro}m of the epilayer. This very encouraging result, demonstrating the possibility for fabricating GaAs p-i-n diodes with depletion layers in high purity GaAs instead of semi-insulating GaAs, is supported by similar results obtained by several other groups. The consequences of using high purity instead of semi-insulating GaAs will be much reduced charge carrier trapping. Diode electrical characteristics and detector performance results using {sup 55}Fe and {sup 241}Am radiation will be discussed.

  4. Continuous visible-light emission at room temperature in Mn-doped GaAs and Si light-emitting diodes (Presentation Recording)

    NASA Astrophysics Data System (ADS)

    Tanaka, Masaaki; Hai, Pham Nam; Anh, Le Duc

    2015-09-01

    We demonstrate visible-light electroluminescence due to d-d transitions in GaAs:Mn based light emitting diodes (LEDs) [1][2]. We prepared p+n junctions with a p+GaAs:Mn layer. At a reverse bias voltage (-3 to -6V), holes are injected from the n-type layer to the depletion layer and accelerated by the intense electric field, and excite the d electrons of Mn in the p+GaAs:Mn layer by impact excitations. We observe visible-light emission E1 = 1.89eV and E2 = 2.16eV, which are exactly the same as the 4T1 -> 6A1 and 4A2 -> 4 T1 transition energy of Mn. Furthermore, by utilizing optical transitions between the p-d hybridized orbitals of Mn atoms doped in Si, we demonstrate Si-based LEDs that continuously emit reddish-yellow visible light at room temperature. The Mn p-d hybrid states are excited by hot holes that are accelerated in the depletion layers of reverse biased Si pn junctions. Above a threshold reverse bias voltage of about -4V, our LEDs show strong visible light emission with two peaks at E1 = 1.75eV and E2 = 2.30eV, corresponding to optical transitions from the t-a (spin-down anti-bonding) states to the e- (spin-down non-bonding) states, and from the e- to the t+a (spin-up anti-bonding) states. The internal quantum efficiency of the E1 and E2 transitions is 3-4 orders of magnitude higher than that of the indirect band-gap transition [3]. [1] P. N. Hai, et al., APL 104, 122409 (2014). [2] P. N. Hai, et al., JAP 116, 113905 (2014). [3] P. N. Hai, et al., submitted.

  5. 670 GHz Schottky Diode Based Subharmonic Mixer with CPW Circuits and 70 GHz IF

    NASA Technical Reports Server (NTRS)

    Chattopadhyay, Goutam (Inventor); Schlecht, Erich T. (Inventor); Lee, Choonsup (Inventor); Lin, Robert H. (Inventor); Gill, John J. (Inventor); Sin, Seth (Inventor); Mehdi, Imran (Inventor)

    2014-01-01

    A coplanar waveguide (CPW) based subharmonic mixer working at 670 GHz using GaAs Schottky diodes. One example of the mixer has a LO input, an RF input and an IF output. Another possible mixer has a LO input, and IF input and an RF output. Each input or output is connected to a coplanar waveguide with a matching network. A pair of antiparallel diodes provides a signal at twice the LO frequency, which is then mixed with a second signal to provide signals having sum and difference frequencies. The output signal of interest is received after passing through a bandpass filter tuned to the frequency range of interest.

  6. Minority carrier injection and current–voltage characteristics of Schottky diodes at high injection level

    NASA Astrophysics Data System (ADS)

    Mnatsakanov, Tigran T.; Levinshtein, Michael E.; Tandoev, Alexey G.; Yurkov, Sergey N.; Palmour, John W.

    2016-07-01

    Transport phenomena in Schottky diodes are analyzed at high injection levels of minority carriers. It is shown that the correct description of these phenomena requires that the mode of diffusion stimulated by the quasi-neutral drift (DSQD) should be considered. An analytical expression for current-voltage characteristics of a Schottky diode at high injection levels is derived. The expression predicts a seemingly paradoxical result: the higher the base doping level, the higher the voltage drop across a diode at the same current density. The analytical results are confirmed by computer simulations. The results may be important for analyses of SiC Junction Barrier Schottky (JBS) diodes at very high current densities (surge current mode).

  7. Understanding Pt–ZnO:In Schottky nanocontacts by conductive atomic force microscopy

    NASA Astrophysics Data System (ADS)

    Chirakkara, Saraswathi; Choudhury, Palash Roy; Nanda, K. K.; Krupanidhi, S. B.

    2016-04-01

    Undoped and In doped ZnO (IZO) thin films are grown on Pt coated silicon substrates Pt/Si by pulsed laser deposition to fabricate Pt/ZnO:In Schottky diodes. The Schottky diodes were investigated by conventional two-probe current–voltage (I–V) measurements and by the I–V spectroscopy tool of conductive atomic force microscopy (C-AFM). The large deviation of the ideality factor from unity and the temperature dependent Schottky barrier heights (SBHs) obtained from the conventional method imply the presence of inhomogeneous interfaces. The inhomogeneity of SBHs is confirmed by C-AFM. Interestingly, the I–V curves at different points are found to be different, and the SBHs deduced from the point diodes reveal inhomogeneity at the nanoscale at the metal–semiconductor interface. A reduction in SBH and turn-on voltage along with enhancement in forward current are observed with increasing indium concentration.

  8. Zr/oxidized diamond interface for high power Schottky diodes

    SciTech Connect

    Traoré, A. Muret, P.; Fiori, A.; Eon, D.; Gheeraert, E.; Pernot, J.

    2014-02-03

    High forward current density of 10{sup 3} A/cm{sup 2} (at 6 V) and a breakdown field larger than 7.7 MV/cm for diamond diodes with a pseudo-vertical architecture, are demonstrated. The power figure of merit is above 244 MW/cm{sup 2} and the relative standard deviation of the reverse current density over 83 diodes is 10% with a mean value of 10{sup −9} A/cm{sup 2}. These results are obtained with zirconium as Schottky contacts on the oxygenated (100) oriented surface of a stack comprising an optimized lightly boron doped diamond layer on a heavily boron doped one, epitaxially grown on a Ib substrate. The origin of such performances are discussed.

  9. Schottky Barrier Catalysis Mechanism in Metal-Assisted Chemical Etching of Silicon.

    PubMed

    Lai, Ruby A; Hymel, Thomas M; Narasimhan, Vijay K; Cui, Yi

    2016-04-13

    Metal-assisted chemical etching (MACE) is a versatile anisotropic etch for silicon although its mechanism is not well understood. Here we propose that the Schottky junction formed between metal and silicon plays an essential role on the distribution of holes in silicon injected from hydrogen peroxide. The proposed mechanism can be used to explain the dependence of the etching kinetics on the doping level, doping type, crystallographic surface direction, and etchant solution composition. We used the doping dependence of the reaction to fabricate a novel etch stop for the reaction. PMID:27018712

  10. Ti/Pd/Ag Contacts to n-Type GaAs for High Current Density Devices

    NASA Astrophysics Data System (ADS)

    Huo, Pengyun; Rey-Stolle, Ignacio

    2016-06-01

    The metallization stack Ti/Pd/Ag on n-type Si has been readily used in solar cells due to its low metal/semiconductor specific contact resistance, very high sheet conductance, bondability, long-term durability, and cost-effectiveness. In this study, the use of Ti/Pd/Ag metallization on n-type GaAs is examined, targeting electronic devices that need to handle high current densities and with grid-like contacts with limited surface coverage (i.e., solar cells, lasers, or light emitting diodes). Ti/Pd/Ag (50 nm/50 nm/1000 nm) metal layers were deposited on n-type GaAs by electron beam evaporation and the contact quality was assessed for different doping levels (from 1.3 × 1018 cm-3 to 1.6 × 1019 cm-3) and annealing temperatures (from 300°C to 750°C). The metal/semiconductor specific contact resistance, metal resistivity, and the morphology of the contacts were studied. The results show that samples doped in the range of 1018 cm-3 had Schottky-like I- V characteristics and only samples doped 1.6 × 1019 cm-3 exhibited ohmic behavior even before annealing. For the ohmic contacts, increasing annealing temperature causes a decrease in the specific contact resistance ( ρ c,Ti/Pd/Ag ~ 5 × 10-4 Ω cm2). In regard to the metal resistivity, Ti/Pd/Ag metallization presents a very good metal conductivity for samples treated below 500°C ( ρ M,Ti/Pd/Ag ~ 2.3 × 10-6 Ω cm); however, for samples treated at 750°C, metal resistivity is strongly degraded due to morphological degradation and contamination in the silver overlayer. As compared to the classic AuGe/Ni/Au metal system, the Ti/Pd/Ag system shows higher metal/semiconductor specific contact resistance and one order of magnitude lower metal resistivity.

  11. Low-Loss Schottky Rectifier Utilizing Trench Sidewall as Junction-Barrier-Controlled Schottky Contact

    NASA Astrophysics Data System (ADS)

    Kim, Han-Soo; Kim, Seong-Dong; Han, Min-Koo; Choi, Yearn-Ik

    1995-02-01

    A novel junction barrier contolled Schottky (JBS) rectifier structure, which has increased the Schottky contact area by utilizing the trench sidewall, has been proposed. The proposed device consists of a JBS rectifier positioned vertically along the trench sidewall as well as laterally along the surface. The additional sidewall Schottky contact reduces the forward voltage drop by enlarging the Schottky active area. The new trench structure shifts the peak electric field from Schottky contact surface to the silicon bulk and the leakage current by the barrier height lowering effect is decreased. An intensive 2-dimensional numerical simulation by MEDICI shows that the leakage current of the trenched JBS rectifier is less than 60% of that of the conventional Schottky rectifier, while the forward voltage drop of the trenched JBS rectifier is almost the same as that of the conventional Schottky rectifier.

  12. Analysing black phosphorus transistors using an analytic Schottky barrier MOSFET model.

    PubMed

    Penumatcha, Ashish V; Salazar, Ramon B; Appenzeller, Joerg

    2015-01-01

    Owing to the difficulties associated with substitutional doping of low-dimensional nanomaterials, most field-effect transistors built from carbon nanotubes, two-dimensional crystals and other low-dimensional channels are Schottky barrier MOSFETs (metal-oxide-semiconductor field-effect transistors). The transmission through a Schottky barrier-MOSFET is dominated by the gate-dependent transmission through the Schottky barriers at the metal-to-channel interfaces. This makes the use of conventional transistor models highly inappropriate and has lead researchers in the past frequently to extract incorrect intrinsic properties, for example, mobility, for many novel nanomaterials. Here we propose a simple modelling approach to quantitatively describe the transfer characteristics of Schottky barrier-MOSFETs from ultra-thin body materials accurately in the device off-state. In particular, after validating the model through the analysis of a set of ultra-thin silicon field-effect transistor data, we have successfully applied our approach to extract Schottky barrier heights for electrons and holes in black phosphorus devices for a large range of body thicknesses. PMID:26563458

  13. Analysing black phosphorus transistors using an analytic Schottky barrier MOSFET model

    PubMed Central

    Penumatcha, Ashish V.; Salazar, Ramon B.; Appenzeller, Joerg

    2015-01-01

    Owing to the difficulties associated with substitutional doping of low-dimensional nanomaterials, most field-effect transistors built from carbon nanotubes, two-dimensional crystals and other low-dimensional channels are Schottky barrier MOSFETs (metal-oxide-semiconductor field-effect transistors). The transmission through a Schottky barrier-MOSFET is dominated by the gate-dependent transmission through the Schottky barriers at the metal-to-channel interfaces. This makes the use of conventional transistor models highly inappropriate and has lead researchers in the past frequently to extract incorrect intrinsic properties, for example, mobility, for many novel nanomaterials. Here we propose a simple modelling approach to quantitatively describe the transfer characteristics of Schottky barrier-MOSFETs from ultra-thin body materials accurately in the device off-state. In particular, after validating the model through the analysis of a set of ultra-thin silicon field-effect transistor data, we have successfully applied our approach to extract Schottky barrier heights for electrons and holes in black phosphorus devices for a large range of body thicknesses. PMID:26563458

  14. Internal Photoemission and X-Ray Photoelectron Spectroscopic Studies of Sulfur-Passivated GaAs

    NASA Astrophysics Data System (ADS)

    Sato, Kenji; Ikoma, Hideaki

    1993-02-01

    Internal photoemission and X-ray photoelectron spectroscopic (XPS) measurements were performed to investigate the effect of sulfur passivation on the GaAs surface and the degradation of the GaAs surface exposed to air ambient after the passivation. The reverse bias dependence of the Schottky barrier height was very small in the as-sulfur-treated sample and was mainly explained by the image force lowering effect. However, it increased as this sample was exposed to air, indicating an increase in the interface state density. The XPS studies showed that both the Ga and As oxides were hardly observed in the sulfur-passivated samples. This indicates that sulfur passivation strongly suppresses oxidation of GaAs. However, a small amount of elemental arsenic was observed with a trace of the As suboxides (such as AsO) after exposure to air and it increased as the exposure time was increased. These results were probably correlated with the increase in the bias dependence of the Schottky barrier height in samples exposed to air after the passivation. Thermal oxidation of GaAs was found to be retarded by sulfur passivation until oxidation time was about 10 min at 300°C. A possible model of suppression of oxidation by sulfur passivation was also discussed.

  15. GaAs laser diode pumped Nd:YAG laser

    NASA Technical Reports Server (NTRS)

    Conant, L. C.; Reno, C. W.

    1974-01-01

    A 1.5-mm by 3-cm neodymium-ion doped YAG laser rod has been side pumped using a GaAs laser diode array tuned to the 8680-A absorption line, achieving a multimode average output power of 120 mW for a total input power of 20 W to the final-stage laser diode drivers. The pumped arrangement was designed to take advantage of the high brightness of a conventional GaAs array as a linear source by introducing the pump light through a slit into a close-wrapped gold coated pump cavity. This cavity forms an integrating chamber for the pump light.

  16. Interface demarcation in GaAs by current pulsing

    NASA Technical Reports Server (NTRS)

    Matthiesen, D. H.; Kafalas, J. A.; Duchene, G. A.; Bellows, A. H.

    1990-01-01

    GTE Laboratories is currently conducting a program to investigate the effect of convection in the melt on the properties of bulk grown gallium arsenide (GaAs). In addition to extensive ground based experimentation, a Get Away Special growth system has been developed to grow two GaAs crystals aboard the Space Shuttle, each with a one inch diameter. In order to perform a complete segregation analysis of the crystals grown in space, it is necessary to measure the interface shape and growth rate as well as the spatial distribution of the selenium dopant. The techniques for interface demarcation in selenium doped GaAs by current pulsing have been developed at GTE Laboratories and successful interface demarcation has been achieved for current pulses ranging from 20 to 90 amps, in both single crystal and polycrystalline regions.

  17. Alpha Schottky junction energy source

    NASA Astrophysics Data System (ADS)

    Litz, Marc S.; Fan, Zhaoyang; Carroll, James J.; Bayne, Stephen

    2012-06-01

    Isotope batteries offer solutions for long-lived low-power sensor requirements. Alpha emitting isotopes have energy per decay 103 times that of beta emitters. Alpha particles are absorbed within 20 μm of most materials reducing shielding mitigation. However, damage to materials from the alphas limits their practical use. A Schottky Barrier Diode (SBD) geometry is considered with an alpha emitting contact-layer on a diamond-like crystal semiconductor region. The radiation tolerance of diamond, the safety of alpha particles, combined with the internal field of the SBD is expected to generate current useful for low-power electronic devices over decades. Device design parameters and calculations of the expected current are described.

  18. Cubic GaS: A Surface Passivator For GaAs

    NASA Technical Reports Server (NTRS)

    Hepp, Aloysius F.; Barron, Andrew R.; Power, Michael B.; Jenkins, Phillip P.; Macinnes, Andrew N.

    1994-01-01

    Thin films of cubic form of gallium sulfide (GaS) formed on surfaces of gallium arsenide (GaAs) substrates via metal/organic chemical vapor deposition (MOCVD). Deposited cubic GaS, crystalline lattice matched to substrate GaAs, neutralizes electrically active defects on surfaces of both n-doped and p-doped GaAs. Enabling important GaAs-based semiconducting materials to serve as substrates for metal/insulator/semiconductor (MIS) capacitors. Cubic GaS enables fabrication of ZnSe-based blue lasers and light-emitting diodes. Because GaS is optically transparent, deposited to form window layers for such optoelectronic devices as light-emitting diodes, solar optical cells, and semiconductor lasers. Its transparency makes it useful as interconnection material in optoelectronic integrated circuits. Also useful in peeled-film technology because selectively etched from GaAs.

  19. Monte Carlo simulation of electron drift velocity in low-temperature-grown gallium arsenide in a Schottky-barrier model

    NASA Astrophysics Data System (ADS)

    Arifin, P.; Goldys, E.; Tansley, T. L.

    1995-08-01

    We present a method of simulating the electron transport in low-temperature-grown GaAs by the Monte Carlo method. Low-temperature-grown GaAs contains microscopic inclusions of As and these inhomogeneities render impossible the standard Monte Carlo mobility simulations. Our method overcomes this difficulty and allows the quantitative prediction of electron transport on the basis of principal microscopic material parameters, including the impurity and the precipitate concentrations and the precipitate size. The adopted approach involves simulations of a single electron trajectory in real space, while the influence of As precipitates on the GaAs matrix is treated in the framework of a Schottky-barrier model. The validity of this approach is verified by evaluation of the drift velocity in homogeneous GaAs where excellent agreement with other workers' results is reached. The drift velocity as a function of electric field in low-temperature-grown GaAs is calculated for a range of As precipitate concentrations. Effect of compensation ratio on drift velocity characteristics is also investigated. It is found that the drift velocity is reduced and the electric field at which the onset of the negative differential mobility occurs increases as the precipitate concentration increases. Both these effects are related to the reduced electron mean free path in the presence of precipitates. Additionally, comparatively high low-field electron mobilities in this material are theoretically explained.

  20. Reverse Schottky-asymmetry spin current detectors

    NASA Astrophysics Data System (ADS)

    Lu, Yuan; Appelbaum, Ian

    2010-10-01

    By reversing the Schottky barrier-height asymmetry in hot-electron semiconductor-metal-semiconductor ballistic spin filtering spin detectors, we have achieved the following: (1) demonstration of >50% spin polarization in silicon, resulting from the increase of detection efficiency by elimination of the ferromagnet/silicon interface on the transport channel detector contact and (2) evidence of spin transport at temperatures as high as 260 K, enabled by an increase in detector Schottky barrier height.

  1. Graphene-Based Reversible Nano-Switch/Sensor Schottky Diode

    NASA Technical Reports Server (NTRS)

    Miranda, Felix A.; Meador, Michael A.; Theofylaktos, Onoufrios; Pinto, Nicholas J.; Mueller, Carl H.; Santos-Perez, Javier

    2010-01-01

    This proof-of-concept device consists of a thin film of graphene deposited on an electrodized doped silicon wafer. The graphene film acts as a conductive path between a gold electrode deposited on top of a silicon dioxide layer and the reversible side of the silicon wafer, so as to form a Schottky diode. By virtue of the two-dimensional nature of graphene, this device has extreme sensitivity to different gaseous species, thereby serving as a building block for a volatile species sensor, with the attribute of having reversibility properties. That is, the sensor cycles between active and passive sensing states in response to the presence or absence of the gaseous species.

  2. A 492 GHz cooled Schottky receiver for radio-astronomy

    NASA Technical Reports Server (NTRS)

    Hernichel, J.; Schieder, R.; Stutzki, J.; Vowinkel, B.; Winnewisser, G.; Zimmermann, Peter

    1992-01-01

    We developed a 492 GHz cooled GaAs Schottky receiver driven by a solid state local oscillator with a DSB noise temperature of 550 K measured at the telescope. The receiver-bandwidth is approx. equal to 1.0 GHz. Quasi-optical mirrors focus the sky and local oscillator radiation into the mixer. Stability analysis via the Allan variance method shows that the total system including a 1 GHz bandwidth acousto-optical spectrometer built in Cologne allows integration times up to 100 sec per half switching cycle. We successfully used the receiver at the KOSMA 3 m telescope on Gornergrat (3150m) located in the central Swiss Alps near Zermatt during January-February 1992 for observations of the 492 GHz, (CI) (3)P1 to (3)P0 fine structure line in several galactic sources. These observations confirm that Gornergrat is an excellent winter submillimeter site in accordance with previous predictions based on the atmospheric opacity from KOSMA 345 GHz measurements.

  3. Epitaxial Fe on free-standing GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Yang, Mingze; Darbandi, Ali; Majumder, Sarmita; Watkins, Simon; Kavanagh, Karen

    2016-07-01

    Epitaxial Fe contacts have been fabricated onto the top half of free-standing, Te-doped GaAs nanowires (NWs) via electrodeposition. Electrical isolation from the substrate via a polymeric layer enabled the measurement of electrical transport through individual wires. Using a fixed probe within a scanning electron microscope, an average metal-semiconductor diode barrier height of 0.69 ± 0.03 eV (ideality factor 1.48 ± 0.02) was found.

  4. Vertically grown Ge nanowire Schottky diodes on Si and Ge substrates

    NASA Astrophysics Data System (ADS)

    Chandra, Nishant; Tracy, Clarence J.; Cho, Jeong-Hyun; Picraux, S. T.; Hathwar, Raghuraj; Goodnick, Stephen M.

    2015-07-01

    The processing and performance of Schottky diodes formed from arrays of vertical Ge nanowires (NWs) grown on Ge and Si substrates are reported. The goal of this work is to investigate CMOS compatible processes for integrating NWs as components of vertically scaled integrated circuits, and elucidate transport in vertical Schottky NWs. Vertical phosphorus (P) doped Ge NWs were grown using vapor-liquid-solid epitaxy, and nickel (Ni)-Ge Schottky contacts were made to the tops of the NWs. Current-voltage (I-V) characteristics were measured for variable ranges of NW diameters and numbers of nanowires in the arrays, and the I-V characteristics were fit using modified thermionic emission theory to extract the barrier height and ideality factor. As grown NWs did not show rectifying behavior due to the presence of heavy P side-wall doping during growth, resulting in a tunnel contact. After sidewall etching using a dilute peroxide solution, rectifying behavior was obtained. Schottky barrier heights of 0.3-0.4 V and ideality factors close to 2 were extracted using thermionic emission theory, although the model does not give an accurate fit across the whole bias range. Attempts to account for enhanced side-wall conduction due to non-uniform P doping profile during growth through a simple shunt resistance improve the fit, but are still insufficient to provide a good fit. Full three-dimensional numerical modeling using Silvaco Atlas indicates that at least part of this effect is due to the presence of fixed charge and acceptor like traps on the NW surface, which leads to effectively high ideality factors.

  5. Thermally Stable Silver Nanowires-Embedding Metal Oxide for Schottky Junction Solar Cells.

    PubMed

    Kim, Hong-Sik; Patel, Malkeshkumar; Park, Hyeong-Ho; Ray, Abhijit; Jeong, Chaehwan; Kim, Joondong

    2016-04-01

    Thermally stable silver nanowires (AgNWs)-embedding metal oxide was applied for Schottky junction solar cells without an intentional doping process in Si. A large scale (100 mm(2)) Schottky solar cell showed a power conversion efficiency of 6.1% under standard illumination, and 8.3% under diffused illumination conditions which is the highest efficiency for AgNWs-involved Schottky junction Si solar cells. Indium-tin-oxide (ITO)-capped AgNWs showed excellent thermal stability with no deformation at 500 °C. The top ITO layer grew in a cylindrical shape along the AgNWs, forming a teardrop shape. The design of ITO/AgNWs/ITO layers is optically beneficial because the AgNWs generate plasmonic photons, due to the AgNWs. Electrical investigations were performed by Mott-Schottky and impedance spectroscopy to reveal the formation of a single space charge region at the interface between Si and AgNWs-embedding ITO layer. We propose a route to design the thermally stable AgNWs for photoelectric device applications with investigation of the optical and electrical aspects. PMID:26971560

  6. Mechanism of Schottky barrier formation: The role of amphoteric native defects

    SciTech Connect

    Walukiewicz, W.

    1987-07-01

    A correlation between the Fermi level pinning deduced from Schottky barrier heights and from electrical properties of irradiated III--V semiconductors is found. The correlation indicates that similar defects are responsible for the Fermi level stabilization in both cases. It is proposed that amphoteric native defects, i.e., the defects which change their electrical characteristics depending on the Fermi level position, play a dominant role in the processes leading to a Schottky barrier formation. A detailed analysis of metal--GaAs contacts shows that in this case the amphoteric defects responsible for the barrier heights are V/sub Ga/ (acceptor) and a donor complex As/sub Ga/+V/sub As/. It is shown that for thick metal coverages two barriers are formed. A surface barrier determined by the charge associated with a native defect and the bulk barrier controlled by the bulk doping. The sum of the two barrier heights satisfies the Schottky condition for the interface, but it is the bulk barrier that determines the macroscopic electrical properties of the contact. The model explains the evolution of the Fermi level position at the interface observed for metal coverages varying in a broad range of thicknesses. The relationship of the present proposal to previous models of Schottky barriers is discussed.

  7. Localized corrosion of GaAs surfaces and formation of porous GaAs

    SciTech Connect

    Schmuki, P.; Vitus, C.M.; Isaacs, H.S.; Fraser, J.; Graham, M.J.

    1995-12-01

    The present work deals with pitting corrosion of p- and n-type GaAs (100). Pit growth can be electrochemically initiated on both conduction types in chloride-containing solutions and leads after extended periods of time to the formation of a porous GaAs structure. In the case of p-type material, localized corrosion is only observed if a passivating film is present on the surface, otherwise -- e.g. in acidic solutions -- the material suffers from a uniform attack (electropolishing) which is independent of the anion present. In contrast, pitting corrosion of n-type material can be triggered independent of the presence of an oxide film. This is explained in terms of the different current limiting factor for the differently doped materials (oxide film in the case of the p- and a space charge layer in the case of the n-GaAs). The porous structure was characterized by SEM, EDX and AES, and consists mainly of GaAs. From scratch experiments it is clear that the pit initiation process is strongly influenced by surface defects. For n-type material, AFM investigations show that light induced roughening of the order of several hundred nm occurs under non-passivating conditions. This nm- scale roughening however does not affect the pitting process.

  8. Improvements on high voltage capacity and high temperature performances of Si-based Schottky potential barrier diode

    NASA Astrophysics Data System (ADS)

    Yongshun, Wang; Li, Rui; Ghaffar, Adnan; Zaixing, Wang; Chunjuan, Liu

    2015-02-01

    In order to improve the reverse voltage capacity and low junction temperature characteristics of the traditional silicon-based Schottky diode, a Schottky diode with high reverse voltage capacity and high junction temperature was fabricated using ion implantation, NiPt60 sputtering, silicide-forming and other major technologies on an N-type silicon epitaxial layer of 10.6-11.4 μm and (2.2-2.4) × 1015 cm-3 doping concentration. The measurement results show that the junction temperature of the Schottky diode fabricated can reach 175 °C, that is 50 °C higher than that of the traditional one; the reverse voltage capacity VR can reach 112 V, that is 80 V higher than that of the traditional one; the leakage current is only 2 μA and the forward conduction voltage drop is VF = 0.71 V at forward current IF = 3 A.

  9. The OAs defect in GaAs: A hybrid density functional study

    NASA Astrophysics Data System (ADS)

    Colleoni, Davide; Pasquarello, Alfredo

    2014-02-01

    The O center substitutional to As (OAs) is addressed through hybrid functional calculations as a candidate defect to explain the Fermi-level pinning in oxygen-doped GaAs. The defect center shows amphoteric behavior which could lead to Fermi-level pinning. However, the calculated charge transition levels only moderately agree with the experimental pinning level. Furthermore, the first-neighbor shell of the O atom and the absence of negative-U behavior clearly contrast with the experimental characterization. Thus, the present results do not support the OAs center as origin of the observed Fermi-level pinning in oxygen-doped GaAs.

  10. Ultrafast terahertz emission properties in GaAs semiconductor

    NASA Astrophysics Data System (ADS)

    Wang, Aihua; Shi, Yulei; Zhou, Qingli

    2015-08-01

    Ultrafast carrier dynamics in Schottky barriers is an extremely active area of research in recent years. The observation of the generation of terahertz pulses from metal/semiconductor interfaces provides a technique to characterize electronic properties of these materials. However, a detailed analysis of these phenomena has not been performed satisfactorily. In this work, the measurements of optically generated terahertz emission from Au/GaAs interfaces are investigated in detail. We observe that, under high laser power excitation, terahertz signals from bare GaAs wafers and Au/GaAs samples exhibit an opposite polarity. The polarity-flip behaviors in the terahertz beams are also observed in the temperature-dependent measurements and the femtosecond pump-generation studies of the Au/GaAs interfaces. These effects can be fully explained in terms of the dynamics of carrier transfer in the Au/GaAs Schottky barriers, which involves the internal photoelectric emission and the electron tunneling effect, and picosecond time constants are found for these processes.

  11. Schottky barrier diode and method thereof

    NASA Technical Reports Server (NTRS)

    Aslam, Shahid (Inventor); Franz, David (Inventor)

    2008-01-01

    Pt/n.sup.-GaN Schottky barrier diodes are disclosed that are particularly suited to serve as ultra-violet sensors operating at wavelengths below 200 nm. The Pt/n.sup.-GaN Schottky barrier diodes have very large active areas, up to 1 cm.sup.2, which exhibit extremely low leakage current at low reverse biases. Very large area Pt/n.sup.-GaN Schottky diodes of sizes 0.25 cm.sup.2 and 1 cm.sup.2 have been fabricated from n.sup.-/n.sup.+ GaN epitaxial layers grown by vapor phase epitaxy on single crystal c-plane sapphire, which showed leakage currents of 14 pA and 2.7 nA, respectively for the 0.25 cm.sup.2 and 1 cm.sup.2 diodes both configured at a 0.5V reverse bias.

  12. Schottky solar cells based on CsSnI3 thin-films

    NASA Astrophysics Data System (ADS)

    Chen, Zhuo; Wang, Jian J.; Ren, Yuhang; Yu, Chonglong; Shum, Kai

    2012-08-01

    We describe a Schottky solar cell based on the perovskite semiconductor CsSnI3 thin-film. The cell consists of a simple layer structure of indium-tin-oxide/CsSnI3/Au/Ti on glass substrate. The measured power conversion efficiency is 0.9%, which is limited by the series and shunt resistance. The influence of light intensity on open-circuit voltage and short-circuit current supports the Schottky solar cell model. Additionally, the spectrally resolved short-circuit current was measured, confirming the unintentionally doped CsSnI3 is of p-type characteristics. The CsSnI3 thin-film was synthesized by alternately depositing layers of SnCl2 and CsI on glass substrate followed by a thermal annealing process.

  13. Characterization of deep electron traps in 4H-SiC Junction Barrier Schottky rectifiers

    NASA Astrophysics Data System (ADS)

    Gelczuk, Ł.; Dąbrowska-Szata, M.; Sochacki, M.; Szmidt, J.

    2014-04-01

    Conventional deep level transient spectroscopy (DLTS) technique was used to study deep electron traps in 4H-SiC Junction Barrier Schottky (JBS) rectifiers. 4H-SiC epitaxial layers, doped with nitrogen and grown on standard n+-4H-SiC substrates were exposed to low-dose aluminum ion implantation process under the Schottky contact in order to form both JBS grid and junction termination extension (JTE), and assure good rectifying properties of the diodes. Several deep electron traps were revealed and attributed to impurities or intrinsic defects in 4H-SiC epitaxial layers, on the basis of comparison of their electrical parameters (i.e. activation energies, apparent capture cross sections and concentrations) with previously published results.

  14. Device Design of Diamond Schottky-pn Diode for Low-Loss Power Electronics

    NASA Astrophysics Data System (ADS)

    Makino, Toshiharu; Kato, Hiromitsu; Takeuchi, Daisuke; Ogura, Masahiko; Okushi, Hideyo; Yamasaki, Satoshi

    2012-09-01

    The device parameters of a novel diamond diode, namely, a Schottky-pn diode (SPND), are analyzed to realize a fast switching time, a low on-resistance, and a high blocking voltage simultaneously. The SPND is composed of an n-type active layer sandwiched between a highly doped p+-type layer and a Schottky metal. The key structure is the fully depleted n-type layer. From the simulations of the energy band diagram based on the key structure of the SPND using Poisson's equations, it is concluded that the low donor density in the n-type layer and the high acceptor density in the p+-type layer are key points for the high-performance SPND.

  15. Micro-inhomogeneity effects and radiation damage in semi-insulating GaAs radiation detectors

    SciTech Connect

    Bates, R.; O`Shea, V.; Raine, C.; Smith, K.M.; Didziulis, R.; Kazukauskas, V.; Rinkevicius, V.; Storasta, J.; Vaitkus, J.

    1998-06-01

    Thermally-stimulated current (TSC) measurements and a detailed analysis of current-voltage (I-V) characteristics have been made on semi-insulating GaAs (SI-GaAs) Schottky diode particle detectors, fabricated on substrates from several supplies, before and after irradiation with 24 GeV protons and 300 MeV pions. The analysis of I-V characteristics allows the determination of the barrier height and bulk resistance in detectors. Changes observed in I-V characteristics and TSC spectra after irradiation are described and a dislocation-net model of radiation-damaged devices is proposed.

  16. Reliability of Cascaded THz Frequency Chains with Planar GaAs Circuits

    NASA Technical Reports Server (NTRS)

    Maiwald, Frank; Schlecht, Erich; Lin, Robert; Ward, John; Pearson, John; Siegel, Peter; Mehdi, Imran

    2004-01-01

    Planar GaAs Schottky diodes will be utilized for all of the LO chains on the HIPI instrument for the Herschel Space Observatory. A better understanding of device degradation mechanisms is desirable in order to specify environmental and operational conditions that do not reduce device life times. Failures and degradation associated with ESD (Electrostatic Discharge), high temperatures, DC currents and RF induced current and heating have been investigated. The goal is to establish a procedure to obtain the safe operating range for a given frequency multiplier.

  17. Performance analysis of undoped cylindrical gate all around (GAA) MOSFET at subthreshold regime

    NASA Astrophysics Data System (ADS)

    Jena, B.; Pradhan, K. P.; Dash, S.; Mishra, G. P.; Sahu, P. K.; Mohapatra, S. K.

    2015-09-01

    In this work the sensitivity of process parameters like channel length (L), channel thickness (tSi), and gate work function (φM) on various performance metrics of an undoped cylindrical gate all around (GAA) metal-oxide-semiconductor field effect transistor (MOSFET) are systematically analyzed. Undoped GAA MOSFET is a radical invention as it introduces a new direction for transistor scaling. In conventional MOSFET, generally the channel doping concentration is very high to provide high on-state current, but in contrary it causes random dopant fluctuation and threshold voltage variation. So, the undoped nature of GAA MOSFET solves the above complications. Hence, we have analyzed the electrical characteristics as well as the analog/RF performances of undoped GAA MOSFET through Sentaurus device simulator.

  18. Processing and characterization of epitaxial GaAs radiation detectors

    NASA Astrophysics Data System (ADS)

    Wu, X.; Peltola, T.; Arsenovich, T.; Gädda, A.; Härkönen, J.; Junkes, A.; Karadzhinova, A.; Kostamo, P.; Lipsanen, H.; Luukka, P.; Mattila, M.; Nenonen, S.; Riekkinen, T.; Tuominen, E.; Winkler, A.

    2015-10-01

    GaAs devices have relatively high atomic numbers (Z=31, 33) and thus extend the X-ray absorption edge beyond that of Si (Z=14) devices. In this study, radiation detectors were processed on GaAs substrates with 110 - 130 μm thick epitaxial absorption volume. Thick undoped and heavily doped p+ epitaxial layers were grown using a custom-made horizontal Chloride Vapor Phase Epitaxy (CVPE) reactor, the growth rate of which was about 10 μm / h. The GaAs p+/i/n+ detectors were characterized by Capacitance Voltage (CV), Current Voltage (IV), Transient Current Technique (TCT) and Deep Level Transient Spectroscopy (DLTS) measurements. The full depletion voltage (Vfd) of the detectors with 110 μm epi-layer thickness is in the range of 8-15 V and the leakage current density is about 10 nA/cm2. The signal transit time determined by TCT is about 5 ns when the bias voltage is well above the value that produces the peak saturation drift velocity of electrons in GaAs at a given thickness. Numerical simulations with an appropriate defect model agree with the experimental results.

  19. Sn-seeded GaAs nanowires grown by MOVPE

    NASA Astrophysics Data System (ADS)

    Sun, Rong; Vainorius, Neimantas; Jacobsson, Daniel; Pistol, Mats-Erik; Lehmann, Sebastian; Dick, Kimberly A.

    2016-05-01

    It has previously been reported that in situ formed Sn nanoparticles can successfully initiate GaAs nanowire growth with a self-assembled radial p–n junction composed of a Sn-doped n-type core and a C-doped p-type shell. In this paper, we investigate the effect of fundamental growth parameters on the morphology and crystal structure of Sn-seeded GaAs nanowires. We show that growth can be achieved in a broad temperature window by changing the TMGa precursor flow simultaneously with decreasing temperature to prevent nanowire kinking at low temperatures. We find that changes in the supply of both AsH3 and TMGa can lead to nanowire kinking and that the formation of twin planes is closely related to a low V/III ratio. From PL results, we observe an increase of the average luminescence energy induced by heavy doping which shifts the Fermi level into the conduction band. Furthermore, the doping level of Sn and C is dependent on both the temperature and the V/III ratio. These results indicate that using Sn as the seed particle for nanowire growth is quite different from traditionally used Au in for example growth conditions and resulting nanowire properties. Thus, it is very interesting to explore alternative metal seed particles with controllable introduction of other impurities.

  20. Sn-seeded GaAs nanowires grown by MOVPE.

    PubMed

    Sun, Rong; Vainorius, Neimantas; Jacobsson, Daniel; Pistol, Mats-Erik; Lehmann, Sebastian; Dick, Kimberly A

    2016-05-27

    It has previously been reported that in situ formed Sn nanoparticles can successfully initiate GaAs nanowire growth with a self-assembled radial p-n junction composed of a Sn-doped n-type core and a C-doped p-type shell. In this paper, we investigate the effect of fundamental growth parameters on the morphology and crystal structure of Sn-seeded GaAs nanowires. We show that growth can be achieved in a broad temperature window by changing the TMGa precursor flow simultaneously with decreasing temperature to prevent nanowire kinking at low temperatures. We find that changes in the supply of both AsH3 and TMGa can lead to nanowire kinking and that the formation of twin planes is closely related to a low V/III ratio. From PL results, we observe an increase of the average luminescence energy induced by heavy doping which shifts the Fermi level into the conduction band. Furthermore, the doping level of Sn and C is dependent on both the temperature and the V/III ratio. These results indicate that using Sn as the seed particle for nanowire growth is quite different from traditionally used Au in for example growth conditions and resulting nanowire properties. Thus, it is very interesting to explore alternative metal seed particles with controllable introduction of other impurities. PMID:27087548

  1. The nature of electrical interaction of Schottky contacts

    SciTech Connect

    Torkhov, N. A.

    2011-08-15

    Electrical interaction between metal-semiconductor contacts combined in a diode matrix with a Schottky barrier manifests itself in an appreciable variation in their surface potentials and static current-volt-characteristics. The necessary condition for appearance of electrical interaction between such contacts consists in the presence of a peripheral electric field (a halo) around them; this field propagates to a fairly large distances (<30 {mu}m). The sufficient condition is the presence of regions where the above halos overlap. It has been shown that variation in the surface potential and the current-voltage characteristics of contacts occurs under the effect of the intrinsic electric field of the contact's periphery and also under the effect of an electric field at matrix periphery; the latter field is formed as a result of superposition of electric fields of halos which form its contacts. The degree of the corresponding effect is governed by the distance between contacts and by the total charge of the space charge regions for all contacts of the matrix: their number, sizes (diameter D{sub i,j}), concentration of doping impurities in the semiconductor N{sub D}, and physical nature of a metal-semiconductor system with a Schottky barrier (with the barrier height {phi}{sub b}). It is established that bringing the contacts closer leads to a relative decrease in the threshold value of the 'dead' zone in the forward current-voltage characteristics, an increase in the effective height of the barrier, and an insignificant increase in the nonideality factor. An increase in the total area of contacts (a total electric charge in the space charge region) in the matrix brings about an increase in the threshold value of the 'dead' zone, a relative decrease in the effective barrier height, and an insignificant increase in the ideality factor.

  2. Graphite-graphene semiconductor junctions and magneto-dielectric coupling in Schottky diodes

    NASA Astrophysics Data System (ADS)

    Tongay, Sefaattin

    The goal of this dissertation is to incorporate graphite and graphene into today's semiconductor technology as a Schottky barrier diodes (metal/semiconductor junctions) that are widely used in metal semiconductor field effect transistors (MESFETs), high electron mobility transistors (HEMTs), high temperature and frequency devices, solar cells and sensors/detectors. The first part of the dissertation aims to give the reader a general idea about the physics at the metal-semiconductor junctions and essential theory background. The second chapter of the dissertation questions effects of temperature and magnetic field on the diode characteristics of Schottky junctions. In this chapter, we present observation of negative magnetocapacitance on GaAs:Si/Au junctions and fully equipped with the theory, we present a phenomenological explanation for the observed effect. In the third chapter, we for the first time introduce multi-layer-graphene as a metal (semimetal) electrode to form Schottky barriers on various technologically significant semiconductors such as Si, GaAs, SiC and GaN. Multi-layer-graphene/ semiconductor junctions not only display good current-voltage (I - V) and capacitance-voltage (C - V) characteristics but also are significant since the Schottky barrier height and characteristics are mainly governed by the interaction and bond formation at few layers on the metal and semiconductor interface. This automatically implies that the presented results also hold for graphene/semiconductor junctions. Chapter 4, takes the Schottky formation at the multi-layer-graphene(graphene)/ semiconductor junction to another level and aims to change the Fermi level of the metal electrode by intercalation with Bromine and tune the barrier height. Observed results are significant in MESFET technology since different barrier height are desired depending on the application. The remainder of the dissertation, focuses on the properties of graphite and graphene to have more

  3. Basic properties of GaAs oxide generated by scanning probe microscope tip-induced nano-oxidation process

    NASA Astrophysics Data System (ADS)

    Okada, Yoshitaka; Iuchi, Yoshimasa; Kawabe, Mitsuo; Harris, James S.

    2000-07-01

    The basic properties of GaAs oxide generated by atomic force microscope (AFM) tip-induced nano-oxidation process have been investigated. The chemical analysis of the AFM tip-generated GaAs oxide was performed by using scanning microprobe x-ray photoelectron spectroscopy, and the main constituents of GaAs anodic oxide were determined to be Ga2O3 and As2O3. The electrical characterization showed that the electron transport across a GaAs oxide nanodot of ˜5.7 nm thickness, from a doped n+-Si tip into the n+-GaAs substrate follows the Fowler-Nordheim tunneling mechanism over a range of applied bias. Further, the tip-generated GaAs oxide nanodots were found to withstand moderate thermal treatments, but some volume reduction was observed.

  4. Stochastic Cooling with Schottky Band Overlap

    SciTech Connect

    Lebedev, Valeri

    2006-03-20

    Optimal use of stochastic cooling is essential to maximize the antiproton stacking rate for Tevatron Run II. Good understanding and characterization of the cooling is important for the optimization. The paper is devoted to derivation of the Fokker-Plank equations justified in the case of near or full Schottky base overlap for both longitudinal and transverse coolings.

  5. Experimental studies of the charge limit phenomenon in NEA GaAs photocathodes

    SciTech Connect

    Tang, H.; Alley, R.K.; Aoyagi, H.; Clendenin, J.E.; Frisch, J.C.; Mulhollan, G.A.; Saez, P.J.; Schultz, D.C.; Turner, J.L.

    1994-06-01

    Negative electron affinity GaAs photocathodes have been in continuous use at SLAC for generating polarized electron beams since early 1992. If the quantum efficiency of a GaAs cathode is below a critical value, the maximum photoemitted charge with photons of energies close to the band gap in a 2-ns pulse is found to be limited by the intrinsic properties of the cathode instead of by the space charge limit. We have studied this novel charge limit phenomenon in a variety of GaAs photocathodes of different structures and doping densities. We find that the charge limit is strongly dependent on the cathode`s quantum efficiency and the extraction electric field, and to a lesser degree on the excitation laser wavelength. In addition, we show that the temporal behavior of the charge limit depends critically on the doping density.

  6. Strong carrier lifetime enhancement in GaAs nanowires coated with semiconducting polymer.

    PubMed

    Yong, Chaw Keong; Noori, Keian; Gao, Qiang; Joyce, Hannah J; Tan, H Hoe; Jagadish, Chennupati; Giustino, Feliciano; Johnston, Michael B; Herz, Laura M

    2012-12-12

    The ultrafast charge carrier dynamics in GaAs/conjugated polymer type II heterojunctions are investigated using time-resolved photoluminescence spectroscopy at 10 K. By probing the photoluminescence at the band edge of GaAs, we observe strong carrier lifetime enhancement for nanowires blended with semiconducting polymers. The enhancement is found to depend crucially on the ionization potential of the polymers with respect to the Fermi energy level at the surface of the GaAs nanowires. We attribute these effects to electron doping by the polymer which reduces the unsaturated surface-state density in GaAs. We find that when the surface of nanowires is terminated by native oxide, the electron injection across the interface is greatly reduced and such surface doping is absent. Our results suggest that surface engineering via π-conjugated polymers can substantially improve the carrier lifetime in nanowire hybrid heterojunctions with applications in photovoltaics and nanoscale photodetectors. PMID:23171081

  7. An alternative methodology in Schottky diode physics

    NASA Astrophysics Data System (ADS)

    Mitra, J.; Feng, L.; Peñate-Quesada, L.; Dawson, P.

    2015-06-01

    The fabrication and electrical characterization of Schottky junction diodes have been extensively researched for three-quarters of a century since the original work of Schottky in 1938. This study breaks from the highly standardized regime of such research and provides an alternative methodology that prompts novel, more efficient applications of the adroit Schottky junction in areas such as chemical and thermal sensing. The core departure from standard Schottky diode configuration is that the metal electrode is of comparable or higher resistance than the underlying semiconductor. Further, complete electrical characterization is accomplished through recording four-probe resistance-temperature (RD-T) characteristics of the device, where electrical sourcing and sensing is done only via the metal electrode and not directly through the semiconductor. Importantly, this results in probing a nominally unbiased junction while eliminating the need for an Ohmic contact to the semiconductor. The characteristic RD-T plot shows two distinct regions of high (metal) and low (semiconductor) resistances at low and high temperatures, respectively, connected by a cross-over region of width, ΔT, within which there is a large negative temperature coefficient of resistance. The RD-T characteristic is highly sensitive to the Schottky barrier height; consequently, at a fixed temperature, RD responds appreciably to small changes in barrier height such as that induced by absorption of a chemical species (e.g., H2) at the interface. A theoretical model is developed to simulate the RD-T data and applied to Pd/p-Si and Pt/p-Si Schottky diodes with a range of metal electrode resistance. The analysis gives near-perfect fits to the experimental RD-T characteristics, yielding the junction properties as fit parameters. The modelling not only helps elucidate the underlying physics but also helps to comprehend the parameter space essential for the discussed applications. Although the primary regime

  8. Formation and properties of porous GaAs

    SciTech Connect

    Schmuki, P.; Lockwood, D.J.; Fraser, J.W.; Graham, M.J.; Isaacs, H.S.

    1996-06-01

    Porous structures on n-type GaAs (100) can be grown electrochemically in chloride-containing solutions. Crystallographic etching of the sample is a precursor stage of the attack. Polarization curves reveal the existanece of a critical onset potential for por formation (PFP). PFP is strongly dependent on the doping level of the sample and presence of surface defects. Good agreement between PFP and breakdown voltage of the space charge layer is found. Surface analysis by EDX, AES, and XPS show that the porous structure consists mainly of GaAs and that anion uptake in the structure can only observed after attackhas been initiated. Photoluminescence measurements reveal (under certain conditions) visible light emission from the porous structure.

  9. The Study of 0.34 THz Monolithically Integrated Fourth Subharmonic Mixer Using Planar Schottky Barrier Diode

    NASA Astrophysics Data System (ADS)

    Tong, Xiaodong; Li, Qian; An, Ning; Wang, Wenjie; Deng, Xiaodong; Zhang, Liang; Liu, Haitao; Zeng, Jianping; Li, Zhiqiang; Tang, Hailing; Xiong, Yong-Zhong

    2015-11-01

    A planar Schottky barrier diode with the designed Schottky contact area of approximately 3 μm2 is developed on gallium arsenide (GaAs) material. The measurements of the developed planar Schottky barrier diode indicate that the zero-biased junction capacitance Cj0 is 11.0 fF, the parasitic series resistance RS is 3.0 Ω, and the cut off frequency fT is 4.8 THz. A monolithically integrated fourth subharmonic mixer with this diode operating at the radio frequency (RF) signal frequency of 0.34 THz with the chip area of 0.6 mm2 is implemented. The intermediate frequency (IF) bandwidth is from DC to 40 GHz. The local oscillator (LO) bandwidth is 37 GHz from 60 to 97 GHz. The RF bandwidth is determined by the bandwidth of the on chip antenna, which is 28 GHz from 322 to 350 GHz. The measurements of the mixer demonstrated a conversion loss of approximately 51 dB.

  10. Enhanced Thermionic Emission and Low 1/f Noise in Exfoliated Graphene/GaN Schottky Barrier Diode.

    PubMed

    Kumar, Ashutosh; Kashid, Ranjit; Ghosh, Arindam; Kumar, Vikram; Singh, Rajendra

    2016-03-30

    Temperature-dependent electrical transport characteristics of exfoliated graphene/GaN Schottky diodes are investigated and compared with conventional Ni/GaN Schottky diodes. The ideality factor of graphene/GaN and Ni/GaN diodes are measured to be 1.33 and 1.51, respectively, which is suggestive of comparatively higher thermionic emission current in graphene/GaN diode. The barrier height values for graphene/GaN diode obtained using thermionic emission model and Richardson plots are found to be 0.60 and 0.72 eV, respectively, which are higher than predicted barrier height ∼0.40 eV as per the Schottky-Mott model. The higher barrier height is attributed to hole doping of graphene due to graphene-Au interaction which shifts the Fermi level in graphene by ∼0.3 eV. The magnitude of flicker noise of graphene/GaN Schottky diode increases up to 175 K followed by its decrease at higher temperatures. This indicates that diffusion currents and barrier inhomogeneities dominate the electronic transport at lower and higher temperatures, respectively. The exfoliated graphene/GaN diode is found to have lower level of barrier inhomogeneities than conventional Ni/GaN diode, as well as earlier reported graphene/GaN diode fabricated using chemical vapor deposited graphene. The lesser barrier inhomogeneities in graphene/GaN diode results in lower flicker noise by 2 orders of magnitude as compared to Ni/GaN diode. Enhanced thermionic emission current, lower level of inhomogeneities, and reduced flicker noise suggests that graphene-GaN Schottky diodes may have the underlying trend for replacing metal-GaN Schottky diodes. PMID:26963627

  11. Schottky diodes and ohmic contacts formed by thermally assisted photolytic laser chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Braichotte, D.; van den Bergh, H.

    Thermally assisted photolytic laser chemical vapor deposition (LCVD) of platinum on n-doped gallium arsenide, a two-phase hybrid scheme for the production of Schottky diodes, is discussed. The low temperature photolytic deposits of the initial slow phase contain a nonnegligible fraction of organic ligand material and tend to be amorphous. In the second phase, light absorption of the photolytically deposited metal causes a temperature rise which facilitates the removal of ligand material from the deposit, and which is sufficient for fast pyrolytic LCVD. Measurements of the influence of light intensity, in addition to metalorganic and inert gas pressure, on the deposition rates in both phases are obtained.

  12. Extreme ultraviolet detection using AlGaN-on-Si inverted Schottky photodiodes

    SciTech Connect

    Malinowski, Pawel E.; Mertens, Robert; Van Hoof, Chris; Duboz, Jean-Yves; Semond, Fabrice; Frayssinet, Eric; Verhoeve, Peter; Giordanengo, Boris; BenMoussa, Ali

    2011-04-04

    We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky diodes for extreme ultraviolet (EUV) detection. AlGaN layers were grown on silicon wafers by molecular beam epitaxy with the conventional and inverted Schottky structure, where the undoped, active layer was grown before or after the n-doped layer, respectively. Different current mechanisms were observed in the two structures. The inverted Schottky diode was designed for the optimized backside sensitivity in the hybrid imagers. A cut-off wavelength of 280 nm was observed with three orders of magnitude intrinsic rejection ratio of the visible radiation. Furthermore, the inverted structure was characterized using a EUV source based on helium discharge and an open electrode design was used to improve the sensitivity. The characteristic He I and He II emission lines were observed at the wavelengths of 58.4 nm and 30.4 nm, respectively, proving the feasibility of using the inverted layer stack for EUV detection.

  13. Controllable resistive switching in Au/Nb:SrTiO3 microscopic Schottky junctions

    NASA Astrophysics Data System (ADS)

    Wang, Yuhang; Shi, Xiaolan; Zhao, Kehan; Xie, Guanlin; Huang, Siyu; Zhang, Liuwan

    2016-02-01

    The reversible resistive switching effect at oxide interface shows promising applications in information storage and artificial intelligence. However, the microscopic switching mechanism is still elusive due to the difficulty of direct observation of the electrical and chemical behavior at the buried interface, which becomes a major barrier to design reliable, scalable, and reproducible devices. Here we used a gold-coated AFM tip as a removable electrode to investigate the resistive switching effect in a microscopic Au/Nb:SrTiO3 Schottky junction. We found that unlike the inhomogeneous random resistive switching in the macroscopic Schottky junctions, the high and low resistance states can be reversibly switched in a controllable way on the Nb-doped SrTiO3 surface by the conductive tip. The switching between the high and low resistance states in vacuum is accompanied by the reversible shift of the surface Fermi level. We indicate that the transfer of the interface oxygen ion in a double-well potential is responsible for the resistive switching in both macroscopic and microscopic Schottky junctions. Our findings provide a guide to optimize the key performance parameters of a resistive switching device such as operation voltage, switching speed, on/off ratio, and state retention time by proper electrode selection and fabrication strategy.

  14. Doping enhanced barrier lowering in graphene-silicon junctions

    NASA Astrophysics Data System (ADS)

    Zhang, Xintong; Zhang, Lining; Chan, Mansun

    2016-06-01

    Rectifying properties of graphene-semiconductor junctions depend on the Schottky barrier height. We report an enhanced barrier lowering in graphene-Si junction and its essential doping dependence in this paper. The electric field due to ionized charge in n-type Si induces the same type doping in graphene and contributes another Schottky barrier lowering factor on top of the image-force-induced lowering (IFIL). We confirm this graphene-doping-induced lowering (GDIL) based on well reproductions of the measured reverse current of our fabricated graphene-Si junctions by the thermionic emission theory. Excellent matching between the theoretical predictions and the junction data of the doping-concentration dependent barrier lowering serves as another evidence of the GDIL. While both GDIL and IFIL are enhanced with the Si doping, GDIL exceeds IFIL with a threshold doping depending on the as-prepared graphene itself.

  15. A 1.2 THz Planar Tripler Using GaAs Membrane Based Chips

    NASA Technical Reports Server (NTRS)

    Bruston, J.; Maestrini, A.; Pukala, D.; Martin, S.; Nakamura, B.; Mehdi, I.

    2001-01-01

    Fabrication technology for submillimeter-wave monolithic circuits has made tremendous progress in recent years and it is now possible to fabricate sub-micron GaAs Schottky devices on a number of substrate types, such as membranes, frame-less membranes or substrateless circuits. These new technologies allow designers to implement very high frequency circuits, either Schottky mixers or multipliers, in a radically new manner. This paper will address the design, fabrication, and preliminary results of a 1.2 THz planar tripler fabricated on a GaAs frame-less membrane, the concept of which was described previously. The tripler uses a diode pair in an antiparallel configuration similar to designs used at lower frequency. To date, this tripler has produced a peak output power of 80 microW with 0.9% efficiency at room temperature (at 1126 GHz). The measured fix-tuned 3 dB bandwidth is about 3.5%. When cooled, the output power reached a peak of 195 microW at 120 K and 250 microW at 50 K. The ease with which this circuit was implemented along with the superb achieved performance indicates that properly designed planar devices such as this tripler can now usher in a new era of practical very high frequency multipliers.

  16. Growth and Photovoltaic Properties of High-Quality GaAs Nanowires Prepared by the Two-Source CVD Method

    NASA Astrophysics Data System (ADS)

    Wang, Ying; Yang, Zaixing; Wu, Xiaofeng; Han, Ning; Liu, Hanyu; Wang, Shuobo; Li, Jun; Tse, WaiMan; Yip, SenPo; Chen, Yunfa; Ho, Johnny C.

    2016-04-01

    Growing high-quality and low-cost GaAs nanowires (NWs) as well as fabricating high-performance NW solar cells by facile means is an important development towards the cost-effective next-generation photovoltaics. In this work, highly crystalline, dense, and long GaAs NWs are successfully synthesized using a two-source method on non-crystalline SiO2 substrates by a simple solid-source chemical vapor deposition method. The high V/III ratio and precursor concentration enabled by this two-source configuration can significantly benefit the NW growth and suppress the crystal defect formation as compared with the conventional one-source system. Since less NW crystal defects would contribute fewer electrons being trapped by the surface oxides, the p-type conductivity is then greatly enhanced as revealed by the electrical characterization of fabricated NW devices. Furthermore, the individual single NW and high-density NW parallel arrays achieved by contact printing can be effectively fabricated into Schottky barrier solar cells simply by employing asymmetric Ni-Al contacts, along with an open circuit voltage of ~0.3 V. All these results indicate the technological promise of these high-quality two-source grown GaAs NWs, especially for the realization of facile Schottky solar cells utilizing the asymmetric Ni-Al contact.

  17. Growth and Photovoltaic Properties of High-Quality GaAs Nanowires Prepared by the Two-Source CVD Method.

    PubMed

    Wang, Ying; Yang, Zaixing; Wu, Xiaofeng; Han, Ning; Liu, Hanyu; Wang, Shuobo; Li, Jun; Tse, WaiMan; Yip, SenPo; Chen, Yunfa; Ho, Johnny C

    2016-12-01

    Growing high-quality and low-cost GaAs nanowires (NWs) as well as fabricating high-performance NW solar cells by facile means is an important development towards the cost-effective next-generation photovoltaics. In this work, highly crystalline, dense, and long GaAs NWs are successfully synthesized using a two-source method on non-crystalline SiO2 substrates by a simple solid-source chemical vapor deposition method. The high V/III ratio and precursor concentration enabled by this two-source configuration can significantly benefit the NW growth and suppress the crystal defect formation as compared with the conventional one-source system. Since less NW crystal defects would contribute fewer electrons being trapped by the surface oxides, the p-type conductivity is then greatly enhanced as revealed by the electrical characterization of fabricated NW devices. Furthermore, the individual single NW and high-density NW parallel arrays achieved by contact printing can be effectively fabricated into Schottky barrier solar cells simply by employing asymmetric Ni-Al contacts, along with an open circuit voltage of ~0.3 V. All these results indicate the technological promise of these high-quality two-source grown GaAs NWs, especially for the realization of facile Schottky solar cells utilizing the asymmetric Ni-Al contact. PMID:27071678

  18. An Alpha Schottky Junction Power Source

    NASA Astrophysics Data System (ADS)

    Litz, Marc; Carroll, James; Henriquez, Stan

    2011-10-01

    Isotope batteries present solutions for long-lived low power sources. Compact sensors, and electronic circuit boards can be powered for the lifetime of infrastructure. Alpha sources are practical for safety reasons because of the limited distance before energy absorption in materials, and the high energy (~5MeV) per particle. Damage to materials from the alphas limits the practical use. A Schottky diode geometry is created from an alpha foil on a diamond-like crystal. A power source is proposed that takes advantage of the radiation damage tolerance of diamond, combined with the short range of the alpha radiation. The internal field of the Schottky barrier creates a current through the diode from electron-hole pairs created by alpha bombardment in the gap. Calculations of the expected current, circuit model results, and design parameters for a device are described.

  19. Schottky diodes from 2D germanane

    NASA Astrophysics Data System (ADS)

    Sahoo, Nanda Gopal; Esteves, Richard J.; Punetha, Vinay Deep; Pestov, Dmitry; Arachchige, Indika U.; McLeskey, James T.

    2016-07-01

    We report on the fabrication and characterization of a Schottky diode made using 2D germanane (hydrogenated germanene). When compared to germanium, the 2D structure has higher electron mobility, an optimal band-gap, and exceptional stability making germanane an outstanding candidate for a variety of opto-electronic devices. One-atom-thick sheets of hydrogenated puckered germanium atoms have been synthesized from a CaGe2 framework via intercalation and characterized by XRD, Raman, and FTIR techniques. The material was then used to fabricate Schottky diodes by suspending the germanane in benzonitrile and drop-casting it onto interdigitated metal electrodes. The devices demonstrate significant rectifying behavior and the outstanding potential of this material.

  20. GaAs Blocked-Impurity-Band Detectors for Far-Infrared Astronomy

    SciTech Connect

    Cardozo, Benjamin Lewin

    2004-12-21

    High-purity and doped GaAs films have been grown by Liquid-phase epitaxy (LPE) for development of a blocked impurity band (BIB) detector for far-infrared radiation. The film growth process developed has resulted in the capability to grow GaAs with a net active impurity concentration below 1 x 10{sup 13} cm{sup -3}, ideal for the blocking layer of the BIB detector. The growth of n-type LPE GaAs films with donor concentrations below the metal-insulator transition, as required for the absorbing layer of a BIB detector, has been achieved. The control of the donor concentration, however, was found to be insufficient for detector production. The growth by LPE of a high-purity film onto a commercially grown vapor-phase epitaxial (VPE) n-type GaAs doped absorbing layer resulted in a BIB device that showed a significant reduction in the low-temperature dark current compared to the absorbing layer only. Extended optical response was not detected, most likely due to the high compensation of the commercially grown GaAs absorbing layer, which restricts the depletion width of the device.

  1. Liquid junction schottky barrier solar cell

    DOEpatents

    Williams, Richard

    1980-01-01

    A mixture of ceric ions (Ce.sup.+4) and cerous ions (Ce.sup.+3) in an aqueous electrolyte solution forms a Schottky barrier at the interface between an active region of silicon and the electrolyte solution. The barrier height obtained for hydrogenated amorphous silicon using the Ce.sup.+4 /Ce.sup.+3 redox couple is about 1.7 eV.

  2. Plastic Schottky-barrier solar cells

    DOEpatents

    Waldrop, J.R.; Cohen, M.J.

    1981-12-30

    A photovoltaic cell structure is fabricated from an active medium including an undoped polyacetylene, organic semiconductor. When a film of such material is in rectifying contact with a metallic area electrode, a Schottky-barrier junction is obtained within the body of the cell structure. Also, a gold overlayer passivates a magnesium layer on the undoped polyacetylene film. With the proper selection and location of elements a photovoltaic cell structure and solar cell are obtained.

  3. Investigation of the optical and electrical properties of p-type porous GaAs structure

    NASA Astrophysics Data System (ADS)

    Saghrouni, H.; Missaoui, A.; Hannachi, R.; Beji, L.

    2013-12-01

    Porous GaAs layers have been formed by electrochemical anodic etching of (1 0 0) heavily doped p-type GaAs substrate in a HF:C2H5OH solution. The surface morphology of porous GaAs has been studied using atomic force microscopy (AFM). Nano-structural nature of the porous layer has been demonstrated by X-ray diffraction analysis (XRD) and confirmed by AFM. An estimation of the main size of the GaAs crystallites obtained from effective mass theory and based on PL data was close to the lowest value obtained from the AFM results. The porous p-GaAs samples are characterised by spectroscopic ellipsometry and modulation spectroscopy techniques. The objective of this study is to determine the porosity, refractive index, and thickness. The porosity of GaAs determined by atomic force microscopy confirmed by the value obtained from the spectroscopic ellipsometry. In fact the current-voltage I(V) characteristics of metal-semiconductor Au/p-GaAs are investigated and compared with Au/p-porous GaAs structures. From the forward bias I(V) characteristics of these devices, the main electrical parameters such as ideality factor, barrier height, and series resistance have been determined.

  4. Fracture mechanics evaluation of GaAs

    NASA Technical Reports Server (NTRS)

    Chen, C. P.

    1984-01-01

    A data base of mechanical and fracture properties for GaAs was generated. The data for single crystal GaAs will be used to design reusable GaAs solar modules. Database information includes; (1) physical property characterizations; (2) fracture behavior evaluations; and (3) strength of cells determined as a function of cell processing and material parameters.

  5. Transport mechanisms and effective Schottky barrier height of ZnO/a-Si:H and ZnO/μc-Si:H heterojunction solar cells

    SciTech Connect

    Corpus-Mendoza, Asiel N. E-mail: m.desouza@sheffield.ac.uk; De Souza, M. M. E-mail: m.desouza@sheffield.ac.uk; Hamelmann, Frank

    2013-11-14

    The impact of boron doping on the p-layer of thin film silicon solar cells is assessed by measuring the effective Schottky barrier height of ZnO/a-Si:H and ZnO/μc-Si:H heterojunctions. A deviation from ideal diode characteristics is revealed by an increase of ideality factor with doping concentration. Higher current densities and lower effective Schottky barriers are evaluated for higher doping levels, resulting in increasingly Ohmic behaviour. This is attributed to an enhancement of tunneling through a thinner depletion region, as supported by computer simulations. Extracted barriers are in the range of 0.7–1 eV for the heterojunctions with rectifying behaviour.

  6. Epitaxial two-dimensional nitrogen atomic sheet in GaAs

    SciTech Connect

    Harada, Yukihiro Yamamoto, Masuki; Baba, Takeshi; Kita, Takashi

    2014-01-27

    We have grown an epitaxial two-dimensional nitrogen (N) atomic sheet in GaAs by using the site-controlled N δ-doping technique. We observed a change of the electronic states in N δ-doped GaAs from the isolated impurity centers to the delocalized impurity band at 1.49 eV with increasing N-doping density. According to the excitation-power- and temperature-dependent photoluminescence (PL) spectra, the emission related to localized levels below the impurity band edge was dominant at low excitation power and temperature, whereas the effects of the localized levels can be neglected by increasing the excitation power and temperature. Furthermore, a clear Landau shift of the PL-peak energy was observed at several Tesla in the Faraday configuration, in contrast to the case in the impurity limit.

  7. Characterization of thermally oxidized Ta/GaAs Schottky barrier structures prepared by low energy RF sputtering with X-ray photoemission, TEM and optical transmittance measurements

    NASA Astrophysics Data System (ADS)

    Gladkov, P.; Varblianska, K.; Marinova, Ts.; Krastev, V.; Stoemenos, J.

    Schottky barrier Ta 2O 5/Ta/GaAs structures produced by RF magnetron sputtering of Ta onto "in situ" sputter etched GaAs substrates are the subject of the present investigation. The tantalum oxides formed directly during the process of thermal recovery of the structures contain predominantly Ta 2O 5 according to XPS data. The component distribution in these structures, formed under optimum recovery conditions with respect to the Schottky barrier parameters ( ΦB and η) has been studied by XPS and TEM. The applied conditions for thermal recovery and simultaneous oxidation are: isothermal annealing at temperatures 400-420°C for 100 min in an ambient of dry air and starting layers of 40 nm RF-sputtered Ta. The partial oxidation of the Ta layer during the heat treatment results in the formation of a thin layer of Ta 2O 5 on the top of the structure, followed by two layers: a mixture of Ta 2O 5 + Ta and a thin Schottky contact predominantly consisting of Ta. The total optical transmittance in the spectral range 0.7-1.1 μ of these three successive layers is ≥ 0.7. This result justifies the potential application of these structures in the creation of Schottky photodiodes in the visible and near-IR. It is established as well that at T ≥ 400°C GaAs and Ta start interacting resulting in the formation of intermetallic compounds of the type: Ta 5Ga, Ta 5Ga 3, and TaGa 3.

  8. 2D-ACAR Studies on Swift Heavy Ion Si-Implanted GaAs

    NASA Astrophysics Data System (ADS)

    Sivaji, K.; Selvakumar, S.

    Material properties modification by high energy heavy ion implantation is a prospective technology leading to many device fabrications. This technique induces defects and hence the physical properties of the materials are modified. The effects of swift heavy ion implantation induced defects by 120 MeV 28+Si ion implantation and doping in SI-GaAs are presented from the electron momentum distribution (EMD) of vacancy-type defects studied by two-dimensional angular correlation of annihilation radiation (2D-ACAR). The positron trapping due to the influence of high-energy Si- implantation in GaAs (n-type) is compared with the corresponding spectra of SI- GaAs and with Si-doped (n-type) GaAs. The EMD of the implanted sample shows a distinct increased isotropic distribution with a characteristic transform of its structure as evident from the low momentum region compared to the pristine sample. The characteristics of defects created by Si doping and by 120 MeV 28+Si ion implantation of undoped semi-insulating (SI) GaAS are discussed. These results indicate the nature of positron trapping in open volume defects such as vacancy clusters created by implantation.

  9. Biexciton emission from single isoelectronic traps formed by nitrogen-nitrogen pairs in GaAs

    SciTech Connect

    Takamiya, Kengo; Fukushima, Toshiyuki; Yagi, Shuhei; Hijikata, Yasuto; Yaguchi, Hiroyuki; Mochizuki, Toshimitsu; Yoshita, Masahiro; Akiyama, Hidefumi; Kuboya, Shigeyuki; Onabe, Kentaro; Katayama, Ryuji

    2013-12-04

    We have studied photoluminescence (PL) from individual isoelectronic traps formed by nitrogen-nitrogen (NN) pairs in GaAs. Sharp emission lines due to exciton and biexciton were observed from individual isoelectronic traps in nitrogen atomic-layer doped (ALD) GaAs. The binding energy of biexciton bound to individual isoelectronic traps was approximately 8 meV. Both the exciton and biexciton luminescence lines show completely random polarization and no fine-structure splitting. These results are desirable to the application to the quantum cryptography used in the field of quantum information technology.

  10. Nitride chemical passivation of a GaAs (100) Surface: Effect on the electrical characteristics of Au/GaAs surface-barrier structures

    SciTech Connect

    Berkovits, V. L. L'vova, T. V.; Ulin, V. P.

    2011-12-15

    The effect of chemical nitridation of GaAs substrates in a hydrazine-sulfide solution on the electrical characteristics of Au/GaAs Schottky structures has been studied. In nitridation of this kind, a solid passivating gallium nitride film with a monolayer thickness is formed on the surface of GaAs, providing almost direct contact between the semiconductor and the metal deposited on its surface. Au/GaAs structures fabricated on nitride substrates have ideality factors close to unity and are characterized by a narrow scatter of potential barrier heights. Prolonged heating of these structures at 350 Degree-Sign C does not change these parameters. The data obtained show that the nitride monolayer formed on the GaAs surface upon treatment in hydrazidesulfide solutions effectively hinders atomic migration across the metal-semiconductor phase boundary.

  11. Design and simulation of an electrically pumped Schottky-junction-based plasmonic amplifier.

    PubMed

    Livani, Abdolber Mallah; Kaatuzian, Hassan

    2015-03-20

    We have investigated an amplifier which operates on surface plasmon polaritons (SPPs). A semiconductor is considered instead of dielectric since its interface with metal can support transverse-magnetic-polarized SPP propagation. A T-shaped cross section for the analyzed waveguide is considered. Metal-semiconductor interface conditions in particular can be regarded as a Schottky junction that has the capability of being pumped electrically. So compensation of propagation loss imposed by metal is possible and beyond that, amplification occurs. This configuration has advantages such as a simple fabrication process and compact size. This scheme has been implemented previously in 3.16, 1.7, and 0.8 μm for increasing the propagation length of the SPP but here, the free-space wavelength of 1.55 μm is considered for designing a plasmonic amplifier. This wavelength is selected because this is the most used wavelength in fiber-optic telecommunications due to its ultralow attenuation in silica. However, designing such an amplifier with too many effects that arise in a Schottky junction may be an extremely difficult process. So simplification, which regards essential effects and ignores nonimportant ones, is included. In this work, gold is considered as the metal and n+-doped In0.53Ga0.47As as the semiconductor to form a Schottky junction. The semiconductor has a doping concentration of 1×1018  cm-3. In forward bias of 1.25 V, the gain coefficient of the SPP mode is estimated up to 337  cm-1 which corresponds to 14.62 dB power gain for a 100 μm long amplifier. PMID:25968496

  12. Self-guarding Schottky barrier infrared detector array

    NASA Astrophysics Data System (ADS)

    Shepherd, F. D., Jr.; Pellegrini, P. W.; Ludington, C. E.; Weeks, M. M.

    1985-07-01

    A two dimensional focal plane array of Schottky photodiodes on a silicon substrate for infrared imaging is presented. The array is designed for mating with multiplexing circuitry and has a self-guarding feature wherein adjacent Schottky electrodes act as guard electrodes. This feature allows a substantial increase of the focal plane area coverage ratio.

  13. Piezotronically modified double Schottky barriers in ZnO varistors.

    PubMed

    Raidl, Nadine; Supancic, Peter; Danzer, Robert; Hofstätter, Michael

    2015-03-25

    Double Schottky barriers in ZnO are modified piezotronically by the application of mechanical stresses. New effects such as the enhancement of the potential barrier height and the increase or decrease of the natural barrier asymmetry are presented. Also, an extended model for the piezotronic modification of double Schottky barriers is given. PMID:25655302

  14. Laterally stacked Schottky diodes for infrared sensor applications

    NASA Technical Reports Server (NTRS)

    Lin, True-Lon (Inventor)

    1991-01-01

    Laterally stacked Schottky diodes for infrared sensor applications are fabricated utilizing porous silicon having pores. A Schottky metal contract is formed in the pores, such as by electroplating. The sensors may be integrated with silicon circuits on the same chip with a high quantum efficiency, which is ideal for IR focal plane array applications due to uniformity and reproducibility.

  15. Analysis of junction-barrier-controlled Schottky (JBS) rectifier characteristics

    NASA Astrophysics Data System (ADS)

    Baliga, B. Jayant

    1985-11-01

    This paper provides analytical solutions for the forward conduction and reverse leakage characteristics of junction-barrier-controlled Schottky (JBS) rectifiers. Good agreement between the calculated output characteristics using these solutions and experimental measurements on devices fabricated with different junction depths and Schottky barrier heights is observed. These equations are valuable for the analysis and design of JBS power rectifiers.

  16. Diffusion studies of Ra and Pb in GaAs by the alpha-particle energy loss method

    NASA Astrophysics Data System (ADS)

    Adamcyk, M.; Beaudoin, M.; Kelson, I.; Levy, Y.; Tiedje, T.

    1998-12-01

    The temperature dependence of the diffusion of lead in GaAs is determined by measuring the modification to the energy spectrum of emitted alpha particles from the decay chain of implanted 212Pb atoms. Diffusion rates are measured for temperatures up to 900 °C. Higher rates are observed for the diffusion in silicon-doped GaAs than in semi-insulating GaAs. An upper limit for the diffusion of radium in GaAs is similarly obtained from the decay of the 224Ra isotope. Implications for the use of implanted alpha sources for thickness monitoring during epitaxial film growth by the alpha-particle energy loss method are discussed.

  17. Amphoteric behavior of Ge in GaAs: an LDA analysis

    NASA Astrophysics Data System (ADS)

    Giorgi, G.; Yamashita, K.

    2011-04-01

    We have studied the stability of neutral and charged Ge substitutional defects (donor, acceptor and molecular) in bulk GaAs host. To correct the severe underestimation given by the local density approximation (LDA) in predicting bandgaps, we have applied the LDA + U scheme (Dudarev et al 1998 Phys. Rev. B 57 1505) to the gallium d orbitals. We have aligned the LDA calculated band edges of GaAs to those calculated at LDA + U level. Then, we have corrected the thermal ionization energies (LDA derived) for the defects considered. The effect of atomic distance in the self-compensation mechanism in the case of Ge2 donor-acceptor defective cells was evaluated. Our results are compared with previous results on IV-doped III-V alloys. We found that self-passivation is the main mechanism for the thermodynamic stabilization of both defective cells and alloys. We have established a relationship between the energy of stabilization versus (1) the amount of molecular Ge2 in the alloys and (2) the distance between Ge donor-acceptor atoms in the supercells, finding an almost linear relationship. We conclude that Ge2-doped GaAs defective systems behave as extremely diluted (GaAs)1-xGe2x alloys (x → 0).

  18. Role of interfacial oxide in high-efficiency graphene-silicon Schottky barrier solar cells.

    PubMed

    Song, Yi; Li, Xinming; Mackin, Charles; Zhang, Xu; Fang, Wenjing; Palacios, Tomás; Zhu, Hongwei; Kong, Jing

    2015-03-11

    The advent of chemical vapor deposition (CVD) grown graphene has allowed researchers to investigate large area graphene/n-silicon Schottky barrier solar cells. Using chemically doped graphene, efficiencies of nearly 10% can be achieved for devices without antireflective coatings. However, many devices reported in past literature often exhibit a distinctive s-shaped kink in the measured I/V curves under illumination resulting in poor fill factor. This behavior is especially prevalent for devices with pristine (not chemically doped) graphene but can be seen in some cases for doped graphene as well. In this work, we show that the native oxide on the silicon presents a transport barrier for photogenerated holes and causes recombination current, which is responsible for causing the kink. We experimentally verify our hypothesis and propose a simple semiconductor physics model that qualitatively captures the effect. Furthermore, we offer an additional optimization to graphene/n-silicon devices: by choosing the optimal oxide thickness, we can increase the efficiency of our devices to 12.4% after chemical doping and to a new record of 15.6% after applying an antireflective coating. PMID:25685934

  19. Fabrication and characterization of Au/p-ZnO Schottky contacts

    NASA Astrophysics Data System (ADS)

    Singh, Brijesh Kumar; Tripathi, Shweta

    2015-09-01

    This paper reports the electrical characteristics of gold contacts on p-type ZnO thin films synthesized by spin coating the sol containing zinc acetate and bismuth nitrate as main precursors. The structural, morphological and optical properties of the deposited thin film have been investigated using X-ray diffraction (XRD), atomic force microscopy (AFM) and Ellipsometry, respectively. Further, hot probe measurement has been used to ascertain the type of deposited film and it was observed that films doped with the concentration of 10 mol% Bi shows p-type nature that was found to be stable over the period of five months. Moreover, reflectance of the Bi doped ZnO with varying Bi concentrations, have also been calculated over the wavelength range of 300-800 nm. The optical band gap of Bi doped ZnO films have also been determined for different concentrations of Bi using the data taken by ellipsometer. The gold (Au) contacts have been deposited on the p-ZnO thin films using low cost thermal evaporation method. Electrical parameters such as the reverse saturation current, barrier height and ideality factor have also been determined for Au/p-ZnO thin film based Schottky contact using conventional thermionic emission model and Cheung's method. The conventional thermionic emission model yields barrier height ∼0.681 eV and ideality factor ∼2.3 however Cheung method gives barrier height ∼0.556 eV, ideality factor ∼2.186 and series resistance ∼923 Ω. The present study establishes the fact that Cheung's method can be the best and most realistic method for approximating the diode parameters including the effect of series resistance of the Au/p-ZnO Schottky diode under consideration.

  20. ON-state characteristics of proton irradiated 4H-SiC Schottky diode: The calibration of model parameters for device simulation

    NASA Astrophysics Data System (ADS)

    Vobecký, J.; Hazdra, P.; Záhlava, V.; Mihaila, A.; Berthou, M.

    2014-04-01

    4H silicon carbide Schottky diodes were irradiated by 550 keV protons with the aim to place the ion range into the low-doped n-type epitaxial layer. The diodes were characterized using DLTS, C-V profiling and forward I-V curves. Calibration procedure of model parameters for device simulation has been carried out. It is based on modeling the doping compensation of the n-type epitaxial layer caused by the deep acceptor levels resulting from radiation damage. It is shown that the agreement of simulated and measured forward I-V curves of proton irradiated diodes can be achieved, if the profiles of deep levels are calibrated with respect to irradiation dose, the degradation of electron mobility due to charged deep levels is accounted of and the Schottky barrier height is properly adjusted. The proposed methodology introduces a starting point for exact calibration of ion irradiated SiC unipolar devices.

  1. A strained silicon cold electron bolometer using Schottky contacts

    SciTech Connect

    Brien, T. L. R. Ade, P. A. R.; Barry, P. S.; Dunscombe, C.; Morozov, D. V.; Sudiwala, R. V.; Leadley, D. R.; Myronov, M.; Parker, E. H. C.; Prest, M. J.; Whall, T. E.; Prunnila, M.; Mauskopf, P. D.

    2014-07-28

    We describe optical characterisation of a strained silicon cold electron bolometer (CEB), operating on a 350 mK stage, designed for absorption of millimetre-wave radiation. The silicon cold electron bolometer utilises Schottky contacts between a superconductor and an n{sup ++} doped silicon island to detect changes in the temperature of the charge carriers in the silicon, due to variations in absorbed radiation. By using strained silicon as the absorber, we decrease the electron-phonon coupling in the device and increase the responsivity to incoming power. The strained silicon absorber is coupled to a planar aluminium twin-slot antenna designed to couple to 160 GHz and that serves as the superconducting contacts. From the measured optical responsivity and spectral response, we calculate a maximum optical efficiency of 50% for radiation coupled into the device by the planar antenna and an overall noise equivalent power, referred to absorbed optical power, of 1.1×10{sup −16} W Hz{sup −1/2} when the detector is observing a 300 K source through a 4 K throughput limiting aperture. Even though this optical system is not optimized, we measure a system noise equivalent temperature difference of 6 mK Hz{sup −1/2}. We measure the noise of the device using a cross-correlation of time stream data, measured simultaneously with two junction field-effect transistor amplifiers, with a base correlated noise level of 300 pV Hz{sup −1/2} and find that the total noise is consistent with a combination of photon noise, current shot noise, and electron-phonon thermal noise.

  2. Schottky barrier parameters and low frequency noise characteristics of graphene-germanium Schottky barrier diode

    NASA Astrophysics Data System (ADS)

    Khurelbaatar, Zagarzusem; Kil, Yeon-Ho; Shim, Kyu-Hwan; Cho, Hyunjin; Kim, Myung-Jong; Lee, Sung-Nam; Jeong, Jae-chan; Hong, Hyobong; Choi, Chel-Jong

    2016-03-01

    We investigated the electrical properties of chemical vapor deposition-grown monolayer graphene/n-type germanium (Ge) Schottky barrier diodes (SBD) using current-voltage (I-V) characteristics and low frequency noise measurements. The Schottky barrier parameters of graphene/n-type Ge SBDs, such as Schottky barrier height (VB), ideality factor (n), and series resistance (Rs), were extracted using the forward I-V and Cheung's methods. The VB and n extracted from the forward ln(I)-V plot were found to be 0.63 eV and 1.78, respectively. In contrast, from Cheung method, the VB and n were calculated to be 0.53 eV and 1.76, respectively. Such a discrepancy between the values of VB calculated from the forward I-V and Cheung's methods indicated a deviation from the ideal thermionic emission of graphene/n-type Ge SBD associated with the voltage drop across graphene. The low frequency noise measurements performed at the frequencies in the range of 10 Hz-1 kHz showed that the graphene/n-type Ge SBD had 1/f γ frequency dependence, with γ ranging from 1.09 to 1.12, regardless of applied forward biases. Similar to forward-biased SBDs operating in the thermionic emission mode, the current noise power spectral density of graphene/n-type Ge SBD was linearly proportional to the forward current.

  3. Doping-induced suppression of dislocation formation in semiconductors

    SciTech Connect

    Walukiewicz, W.

    1989-04-15

    A mechanism explaining suppression of dislocation formation in doped semiconductors is proposed. The mechanism is based on the recently introduced concept of amphoteric native defects. It is shown that supersaturation of vacancylike defects depends on the Fermi energy and thus also on the doping level. The calculated dependence of supersaturation on the doping level quantitatively accounts for experimentally observed trends in dislocation suppression in GaAs and InP.

  4. Simulation of phosphorene Schottky-barrier transistors

    NASA Astrophysics Data System (ADS)

    Wan, Runlai; Cao, Xi; Guo, Jing

    2014-10-01

    Schottky barrier field-effect transistors (SBFETs) based on few and mono layer phosphorene are simulated by the non-equilibrium Green's function formalism. It is shown that scaling down the gate oxide thickness results in pronounced ambipolar I-V characteristics and significant increase of the minimal leakage current. The problem of leakage is especially severe when the gate insulator is thin and the number of layer is large, but can be effectively suppressed by reducing phosphorene to mono or bilayer. Different from two-dimensional graphene and layered dichalcogenide materials, both the ON-current of the phosphorene SBFETs and the metal-semiconductor contact resistance between metal and phosphorene strongly depend on the transport crystalline direction.

  5. Design, fabrication and characterization of a Schottky diode on an AlGaAs/GaAs HEMT structure for on-chip RF power detection

    NASA Astrophysics Data System (ADS)

    Mustafa, Farahiyah; Parimon, Norfarariyanti; Hashim, Abdul Manaf; Abd Rahman, Shaharin Fadzli; Abdul Rahman, Abdul Rahim; Osman, Mohd Nizam

    2010-02-01

    A Schottky diode was designed and fabricated on an n-AlGaAs/GaAs high electron mobility transistor (HEMT) structure for RF power detection. The processing steps used in the fabrication were the conventional steps used in standard GaAs processing. Current-voltage measurements showed that the devices had rectifying properties with a barrier height of 0.5289-0.5468 eV. The fabricated Schottky diodes detected RF signals well and their cut-off frequencies up to 20 GHz were estimated in direct injection experiments. To achieve a high cut-off frequency, a smaller Schottky contact area is required. The feasibility of direct integration with the planar dipole antenna via a coplanar waveguide transmission line without insertion of matching circuits was discussed. A higher cut-off frequency can also be achieved by reducing the length of the coplanar waveguide transmission line. These preliminary results represent a breakthrough as regards direct on-chip integration technology, towards the realization of a ubiquitous network society.

  6. Characterization of vertical Au/β-Ga2O3 single-crystal Schottky photodiodes with MBE-grown high-resistivity epitaxial layer

    NASA Astrophysics Data System (ADS)

    X, Z. Liu; C, Yue; C, T. Xia; W, L. Zhang

    2016-01-01

    High-resistivity β-Ga2O3 thin films were grown on Si-doped n-type conductive β-Ga2O3 single crystals by molecular beam epitaxy (MBE). Vertical-type Schottky diodes were fabricated, and the electrical properties of the Schottky diodes were studied in this letter. The ideality factor and the series resistance of the Schottky diodes were estimated to be about 1.4 and 4.6× 106 Ω. The ionized donor concentration and the spreading voltage in the Schottky diodes region are about 4 × 1018 cm-3 and 7.6 V, respectively. The ultra-violet (UV) photo-sensitivity of the Schottky diodes was demonstrated by a low-pressure mercury lamp illumination. A photoresponsivity of 1.8 A/W and an external quantum efficiency of 8.7 × 102% were observed at forward bias voltage of 3.8 V, the proper driving voltage of read-out integrated circuit for UV camera. The gain of the Schottky diode was attributed to the existence of a potential barrier in the i-n junction between the MBE-grown highly resistive β-Ga2O3 thin films and the n-type conductive β-Ga2O3 single-crystal substrate. Project supported by the National Nature Science Foundation of China (Grant No. 61223002) the Science and Technology Commission of Shanghai Municipality, China (Grant No. 13111103700), and the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No. 2012018530003).

  7. Identification of oxygen-related midgap level in GaAs

    NASA Technical Reports Server (NTRS)

    Lagowski, J.; Lin, D. G.; Gatos, H. C.; Aoyama, T.

    1984-01-01

    An oxygen-related deep level ELO was identified in GaAs employing Bridgman-grown crystals with controlled oxygen doping. The activation energy of ELO is almost the same as that of the dominant midgap level: EL2. This fact impedes the identification of ELO by standard deep level transient spectroscopy. However, it was found that the electron capture cross section of ELO is about four times greater than that of EL2. This characteristic served as the basis for the separation and quantitative investigation of ELO employing detailed capacitance transient measurements in conjunction with reference measurements on crystals grown without oxygen doping and containing only EL2.

  8. Determination of carrier concentration and compensation microprofiles in GaAs

    NASA Technical Reports Server (NTRS)

    Jastrzebski, L.; Lagowski, J.; Walukiewicz, W.; Gatos, H. C.

    1980-01-01

    Simultaneous microprofiling of semiconductor free carrier, donor, and acceptor concentrations was achieved for the first time from the absolute value of the free carrier absorption coefficient and its wavelength dependence determined by IR absorption in a scanning mode. Employing Ge- and Si-doped melt-grown GaAs, striking differences were found between the variations of electron concentration and those of ionized impurity concentrations. These results showed clearly that the electronic characteristics of this material are controlled by amphoteric doping and deviations from stoichiometry rather than by impurity segregation.

  9. Development and fabrication of improved Schottky power diodes

    NASA Technical Reports Server (NTRS)

    Cordes, L. F.; Garfinkel, M.; Taft, E. A.

    1975-01-01

    Reproducible methods for the fabrication of silicon Schottky diodes have been developed for tungsten, aluminum, conventional platinum silicide, and low temperature platinum silicide. Barrier heights and barrier lowering under reverse bias have been measured, permitting the accurate prediction of forward and reverse diode characteristics. Processing procedures have been developed that permit the fabrication of large area (about 1 sq cm) mesageometry power Schottky diodes with forward and reverse characteristics that approach theoretical values. A theoretical analysis of the operation of bridge rectifier circuits has been performed, which indicates the ranges of frequency and voltage for which Schottky rectifiers are preferred to p-n junctions. Power Schottky rectifiers have been fabricated and tested for voltage ratings up to 140 volts.

  10. Effect of Post Deposition Annealing Treatments on Properties of AZO Thin Films for Schottky Diode Applications.

    PubMed

    Singh, Shaivalini; Park, Si-Hyun

    2016-01-01

    High-quality aluminum (Al) doped ZnO (AZO) thin films were deposited on silicon substrates by RF sputtering at room temperature. The deposited films were annealed from the temperatures 350 °C to 650 °C in pure nitrogen (N₂) ambient. The effects of annealing on the microstructural, optical and electrical properties of the AZO films were investigated. A detailed analysis by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Four Probe and Hall measurements was performed to study the properties of these AZO thin films. It was observed that all of the as-deposited and annealed AZO films have homogenous surfaces and hexagonal wurtzite structures with good crystalline quality. The study also suggested that there was an intermediate post annealing temperature (450 °C) at which the deposited ZnO film exhibit best surface characteristics. Pd/AZO Schottky devices were fabricated with 450 °C annealed AZO thin films and the parameters of Schottky devices were extracted from I-V characteristics. These results indicated that the Pd/AZO films were very much suitable for various optoelectronics applications particularly for metal semiconductor metal based UV detector application. PMID:27398537