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Sample records for electron-beam deposited ceria

  1. Electron Beam Ablation and Deposition

    NASA Astrophysics Data System (ADS)

    Kovaleski, S. D.; Gilgenbach, R. M.; Ang, L. K.; Lau, Y. Y.

    1997-11-01

    Ablation of fused silica, titanium nitride, and boron nitride with a channel spark electron beam is being studied. The channel spark is a low energy (15-20kV), high current (1600A) electron beam source developed at KFK(G. Muller and C. Schultheiss, Proc. of Beams `94, Vol. II, p833). This is a pseudospark device which operates in the ion focused regime of electron beam transport. For this reason, a low pressure (10-15mTorr of Ar) background gas is used to provide electron beam focusing. Plume composition and excitation has been studied via optical emission spectroscopy. Ablation has also been imaged photographically. Electron density gradients and densities are being studied through laser deflection. Film deposition experiments are also being performed. Electron transport and energy deposition in metals are being simulated in the ITS-TIGER code(Sandia Report No. SAND 91-1634).

  2. Focused electron beam induced deposition: A perspective

    PubMed Central

    Porrati, Fabrizio; Schwalb, Christian; Winhold, Marcel; Sachser, Roland; Dukic, Maja; Adams, Jonathan; Fantner, Georg

    2012-01-01

    Summary Background: Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on a substrate surface is dissociated in the focus of an electron beam. After 20 years of continuous development FEBID has reached a stage at which this technique is now particularly attractive for several areas in both, basic and applied research. The present topical review addresses selected examples that highlight this development in the areas of charge-transport regimes in nanogranular metals close to an insulator-to-metal transition, the use of these materials for strain- and magnetic-field sensing, and the prospect of extending FEBID to multicomponent systems, such as binary alloys and intermetallic compounds with cooperative ground states. Results: After a brief introduction to the technique, recent work concerning FEBID of Pt–Si alloys and (hard-magnetic) Co–Pt intermetallic compounds on the nanometer scale is reviewed. The growth process in the presence of two precursors, whose flux is independently controlled, is analyzed within a continuum model of FEBID that employs rate equations. Predictions are made for the tunability of the composition of the Co–Pt system by simply changing the dwell time of the electron beam during the writing process. The charge-transport regimes of nanogranular metals are reviewed next with a focus on recent theoretical advancements in the field. As a case study the transport properties of Pt–C nanogranular FEBID structures are discussed. It is shown that by means of a post-growth electron-irradiation treatment the electronic intergrain-coupling strength can be continuously tuned over a wide range. This provides unique access to the transport properties of this material close to the insulator-to-metal transition. In the last part of the review, recent developments in mechanical strain

  3. Patterned electrochemical deposition of copper using an electron beam

    SciTech Connect

    Heijer, Mark den; Shao, Ingrid; Reuter, Mark C.; Ross, Frances M.; Radisic, Alex

    2014-02-01

    We describe a technique for patterning clusters of metal using electrochemical deposition. By operating an electrochemical cell in the transmission electron microscope, we deposit Cu on Au under potentiostatic conditions. For acidified copper sulphate electrolytes, nucleation occurs uniformly over the electrode. However, when chloride ions are added there is a range of applied potentials over which nucleation occurs only in areas irradiated by the electron beam. By scanning the beam we control nucleation to form patterns of deposited copper. We discuss the mechanism for this effect in terms of electron beam-induced reactions with copper chloride, and consider possible applications.

  4. Silicon nitride films deposited with an electron beam created plasma

    NASA Astrophysics Data System (ADS)

    Bishop, D. C.; Emery, K. A.; Rocca, J. J.; Thompson, L. R.; Zamani, H.; Collins, G. J.

    1984-03-01

    The electron beam assisted chemical vapor deposition (EBCVD) of silicon nitride films using NH3, N2, and SiH4 as the reactant gases is reported. The films have been deposited on aluminum, SiO2, and polysilicon film substrates as well as on crystalline silicon substrates. The range of experimental conditions under which silicon nitrides have been deposited includes substrate temperatures from 50 to 400 C, electron beam currents of 2-40 mA, electron beam energies of 1-5 keV, total ambient pressures of 0.1-0.4 Torr, and NH3/SiH4 mass flow ratios of 1-80. The physical, electrical, and chemical properties of the EBCVD films are discussed.

  5. An investigation of nonuniform dose deposition from an electron beam

    NASA Astrophysics Data System (ADS)

    Lilley, William; Luu, Kieu X.

    1994-08-01

    In a search for an explanation of nonuniform electron-beam dose deposition, the integrated tiger series (ITS) of coupled electron/photon Monte Carlo transport codes was used to calculate energy deposition in the package materials of an application-specific integrated circuit (ASIC) while the thicknesses of some of the materials were varied. The thicknesses of three materials that were in the path of an electron-beam pulse were varied independently so that analysis could determine how the radiation dose measurements using thermoluminescent dosimeters (TLD's) would be affected. The three materials were chosen because they could vary during insertion of the die into the package or during the process of taking dose measurements. The materials were aluminum, HIPEC (a plastic), and silver epoxy. The calculations showed that with very small variations in thickness, the silver epoxy had a large effect on the dose uniformity over the area of the die.

  6. Electron Beam Freeform Fabrication: A Rapid Metal Deposition Process

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M. B.; Hafley, Robert A.

    2003-01-01

    Manufacturing of structural metal parts directly from computer aided design (CAD) data has been investigated by numerous researchers over the past decade. Researchers at NASA Langley REsearch Center are developing a new solid freeform fabrication process, electron beam freeform fabrication (EBF), as a rapid metal deposition process that works efficiently with a variety of weldable alloys. The EBF process introduces metal wire feedstock into a molten pool that is created and sustained using a focused electron beam in a vacuum environment. Thus far, this technique has been demonstrated on aluminum and titanium alloys of interest for aerospace structural applications nickel and ferrous based alloys are also planned. Deposits resulting from 2219 aluminum demonstrations have exhibited a range of grain morphologies depending upon the deposition parameters. These materials ave exhibited excellent tensile properties comparable to typical handbook data for wrought plate product after post-processing heat treatments. The EBF process is capable of bulk metal deposition at deposition rated in excess of 2500 cubic centimeters per hour (150 cubic inches per our) or finer detail at lower deposition rates, depending upon the desired application. This process offers the potential for rapidly adding structural details to simpler cast or forged structures rather than the conventional approach of machining large volumes of chips to produce a monolithic metallic structure. Selective addition of metal onto simpler blanks of material can have a significant effect on lead time reduction and lower material and machining costs.

  7. A critical literature review of focused electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    van Dorp, W. F.; Hagen, C. W.

    2008-10-01

    An extensive review is given of the results from literature on electron beam induced deposition. Electron beam induced deposition is a complex process, where many and often mutually dependent factors are involved. The process has been studied by many over many years in many different experimental setups, so it is not surprising that there is a great variety of experimental results. To come to a better understanding of the process, it is important to see to which extent the experimental results are consistent with each other and with the existing model. All results from literature were categorized by sorting the data according to the specific parameter that was varied (current density, acceleration voltage, scan patterns, etc.). Each of these parameters can have an effect on the final deposit properties, such as the physical dimensions, the composition, the morphology, or the conductivity. For each parameter-property combination, the available data are discussed and (as far as possible) interpreted. By combining models for electron scattering in a solid, two different growth regimes, and electron beam induced heating, the majority of the experimental results were explained qualitatively. This indicates that the physical processes are well understood, although quantitatively speaking the models can still be improved. The review makes clear that several major issues remain. One issue encountered when interpreting results from literature is the lack of data. Often, important parameters (such as the local precursor pressure) are not reported, which can complicate interpretation of the results. Another issue is the fact that the cross section for electron induced dissociation is unknown. In a number of cases, a correlation between the vertical growth rate and the secondary electron yield was found, which suggests that the secondary electrons dominate the dissociation rather than the primary electrons. Conclusive evidence for this hypothesis has not been found. Finally

  8. Focused electron beam induced deposition of pure SIO II

    NASA Astrophysics Data System (ADS)

    Perentes, Alexandre; Hoffmann, Patrik; Munnik, Frans

    2007-02-01

    Focused electron beam induced processing (FEBID) equipments are the "all in one" tools for high resolution investigation, and modification of nano-devices. Focused electron beam induced deposition from a gaseous precursor usually results in a nano-composite sub-structured material, in which the interesting material is embedded in an amorphous carbonaceous matrix. Using the Hydrogen free tetraisocyanatosilane Si(NCO) 4 molecule as Si source, we show how a controlled oxygen flux, simultaneously injected with the precursor vapors, causes contaminants to vanish from the FEB deposits obtained and leads to the deposition of pure SiO II. The chemical composition of the FEBID material could be controlled from SiC IINO 3 to SiO II, the latter containing undetectable foreign element contamination. The [O II] / [TICS] ratio needed to obtain SiO II in our FEB deposition equipment is larger than 300. The evolution of the FEBID material chemical composition is presented as function of the [O II] / [TICS] molecular flux ratios. A hypothetical decomposition pathway of this silane under these conditions is discussed based on the different species formed under electron bombardment of TICS. Transmission electron microscopy investigations demonstrated that the deposited oxide is smooth (roughness sub 2nm) and amorphous. Infrared spectroscopy confirmed the low concentration of hydroxyl groups. The Hydrogen content of the deposited oxide, measured by elastic recoil detection analysis, is as low as 1 at%. 193nm wavelength AIMS investigations of 125nm thick SiO II pads (obtained with [O II] / [TICS] = 325) showed an undetectable light absorption.

  9. Electron beam deposition for nanofabrication: Insights from surface science

    NASA Astrophysics Data System (ADS)

    Wnuk, J. D.; Rosenberg, S. G.; Gorham, J. M.; van Dorp, W. F.; Hagen, C. W.; Fairbrother, D. H.

    2011-02-01

    Electron beam induced deposition (EBID) is a direct-write lithographic technique that utilizes the dissociation of volatile precursors by a focused electron beam in a low vacuum environment to create nanostructures. Notable advantages of EBID over competing lithographic techniques are that it is a single step process that allows three-dimensional free-standing structures to be created, including features with single-nanometer scale dimensions. However, despite the inherent advantages of EBID, scientific and technological issues are impeding its development as an industrial nanofabrication tool. Perhaps the greatest single limitation of EBID is that metal-containing nanostructures deposited from organometallic precursors typically possess unacceptable levels of organic contamination which adversely affects the material's properties. In addition to the issue of purity, there is also a lack of understanding and quantitative information on the fundamental surface reactions and reaction cross-sections that are responsible for EBID. In this prospective, we describe how surface analytical techniques have begun to provide mechanistic and kinetic insights into the molecular level processes associated with EBID. This has been achieved by observing the effect of electron irradiation on nanometer thick films of organometallic precursors adsorbed onto solid substrates at low temperatures (< 200 K) under ultra-high vacuum conditions. Experimental observations include probing changes in surface composition, metal oxidation state, and the evolution of volatile species. Insights into surface reactions associated with purification strategies are also detailed. We also discuss unresolved scientific challenges and opportunities for future EBID research.

  10. Studies of the mechanism of electron beam induced deposition (EBID)

    NASA Astrophysics Data System (ADS)

    Choi, Young Ryong

    The controlled deposition of metals resulting from the passage of an ion beam through an atmosphere of a suitable precursor gas is a well-established procedure for micro scale materials manipulation. While the ion beam technique is rapid and reliable it has the disadvantage that the beam itself can ablate and contaminate the target with Gallium or other materials, and the fact that ion optics are less widely accessible than electron optical columns. We have therefore been investigating the theory and practice of depositing metal using an electron beam and variety of precursor gases. The aim of this work is to develop techniques that can be applied to the repair of the optical, ultra-violet (UV) and extreme ultra-violet (EUV) masks used in high performance photo-lithography. This thesis is concentrated on electron beam induced deposition (EBID) performed in a commercial Scanning Electron Microscope (SEM). For EBID experiments, we have developed a gas injection system for the specimen chamber of a standard SEM which is able to control the pressure and the delivery flow rate of gas for experiment. Studies of factors that control the properties of the deposition---such as the electron-gas interactions, the effects of gas pressure, and the temperature of the substrate---have been made and experiments to determine the fundamental mechanisms of EBID---such as which types of electrons are responsible for the initial interaction event with the precursor---have been carried out and analyzed and systematically studied to determine the optimum conditions for the practical application of the EBID approach. Finally the practical applications of the EBID have been applied to repair of masks.

  11. Rapid tooling by electron-beam vapor deposition

    SciTech Connect

    Meier, T. C., LLNL

    1998-02-25

    Electron-beam physical vapor deposition (EBPVD) of tooling metal, onto a shaped substrate to produce a replica of the substrate surface, offers the potential for significant cost savings over present methods of injection mold manufacturing. These savings are realized by the high deposition rate and the corresponding short manufacturing times provided by the EBPVD process. However, on route to realizing these gains, there are process technical issues which need to be resolved. Mold surfaces typically contain relatively high aspect ratio details that must be replicated to dimensional tolerances within +/- 2 mils. The deposited mold material must also provide high surface hardness and high fracture toughness. Good quality grain structure can be obtained in deposited Al 10-wt% Cu mold material when the substrate and corresponding deposit are at high process temperature. However, the resulting mold is subject to distortion during cooldown due to differential temperatures and shrinkage rates. Thermally controlled cooldown and the use of crushable substrate materials reduce these distortions, but not to the required levels of tolerance. Deposition of the Al-Cu at lower temperature produces columnar, poorly joined grains which result in a brittle and weakened mold material. When Al 10-wt% Cu metal vapor is deposited across high aspect ratio step features on the substrate surface, a grain growth defect can form in the step-shadowed regions of the deposited material, alongside the step feature. The step coverage defect consists of entrained voids which persist at intermediate deposition temperatures and produce a weakened mold. This final 1997 LDRD report investigates causes of this step coverage defect and offers methods for their control and elimination.

  12. Fundamental proximity effects in focused electron beam induced deposition.

    PubMed

    Plank, Harald; Smith, Daryl A; Haber, Thomas; Rack, Philip D; Hofer, Ferdinand

    2012-01-24

    Fundamental proximity effects for electron beam induced deposition processes on nonflat surfaces were studied experimentally and via simulation. Two specific effects were elucidated and exploited to considerably increase the volumetric growth rate of this nanoscale direct write method: (1) increasing the scanning electron pitch to the scale of the lateral electron straggle increased the volumetric growth rate by 250% by enhancing the effective forward scattered, backscattered, and secondary electron coefficients as well as by strong recollection effects of adjacent features; and (2) strategic patterning sequences are introduced to reduce precursor depletion effects which increase volumetric growth rates by more than 90%, demonstrating the strong influence of patterning parameters on the final performance of this powerful direct write technique. PMID:22181556

  13. Superconducting nanowires by electron-beam-induced deposition

    SciTech Connect

    Sengupta, Shamashis; Li, Chuan; Guéron, S.; Bouchiat, H.; Baumier, Cedric; Fortuna, F.; Kasumov, Alik

    2015-01-26

    Superconducting nanowires can be fabricated by decomposition of an organometallic gas using a focused beam of Ga ions. However, physical damage and unintentional doping often result from the exposure to the ion beam, motivating the search for a means to achieve similar structures with a beam of electrons instead of ions. This has so far remained an experimental challenge. We report the fabrication of superconducting tungsten nanowires by electron-beam-induced-deposition, with critical temperature of 2.0 K and critical magnetic field of 3.7 T, and compare them with superconducting wires made with ions. This work is an important development for the template-free realization of nanoscale superconducting devices, without the requirement of an ion beam column.

  14. Fundamental Proximity Effects in Focused electron Beam Induced Deposition

    SciTech Connect

    Plank, Harald; Smith, Daryl; Haber, Thomas; Rack, Philip D; Hofer, Ferdinand

    2012-01-01

    Fundamental proximity effects for electron beam induced deposition processes on nonflat surfaces were studied experimentally and via simulation. Two specific effects were elucidated and exploited to considerably increase the volumetric growth rate of this nanoscale direct write method: (1) increasing the scanning electron pitch to the scale of the lateral electron straggle increased the volumetric growth rate by 250% by enhancing the effective forward scattered, backscattered, and secondary electron coefficients as well as by strong recollection effects of adjacent features; and (2) strategic patterning sequences are introduced to reduce precursor depletion effects which increase volumetric growth rates by more than 90%, demonstrating the strong influence of patterning parameters on the final performance of this powerful direct write technique.

  15. Superconducting nanowires by electron-beam-induced deposition

    NASA Astrophysics Data System (ADS)

    Sengupta, Shamashis; Li, Chuan; Baumier, Cedric; Kasumov, Alik; Guéron, S.; Bouchiat, H.; Fortuna, F.

    2015-01-01

    Superconducting nanowires can be fabricated by decomposition of an organometallic gas using a focused beam of Ga ions. However, physical damage and unintentional doping often result from the exposure to the ion beam, motivating the search for a means to achieve similar structures with a beam of electrons instead of ions. This has so far remained an experimental challenge. We report the fabrication of superconducting tungsten nanowires by electron-beam-induced-deposition, with critical temperature of 2.0 K and critical magnetic field of 3.7 T, and compare them with superconducting wires made with ions. This work is an important development for the template-free realization of nanoscale superconducting devices, without the requirement of an ion beam column.

  16. An Optimized Nanoparticle Separator Enabled by Electron Beam Induced Deposition

    SciTech Connect

    Fowlkes, Jason Davidson; Doktycz, Mitchel John; Rack, P. D.

    2010-01-01

    Size based separations technologies will inevitably benefit from advances in nanotechnology. Direct write nanofabrication provides a useful mechanism to deposit/etch nanoscale elements in environments otherwise inaccessible to conventional nanofabrication techniques. Here, electron beam induced deposition (EBID) was used to deposit an array of nanoscale features in a 3D environment with minimal material proximity effects outside the beam interaction region (BIR). Specifically, the membrane component of a nanoparticle separator was fabricated by depositing a linear array of sharply tipped nanopillars, with a singular pitch, designed for sub 50nm nanoparticle permeability. The nanopillar membrane was used in a dual capacity to control the flow of nanoparticles in the transaxial direction of the array while facilitating the sealing of the cellular sized compartment in the paraxial direction. An optimized growth recipe resulted which (1) maximized the growth efficiency of the membrane (which minimizes proximity effects), (2) preserved the fidelity of spacing between nanopillars (which maximizes the size based gating quality of the membrane) while (3) maintaining sharp nanopillar apexes for impaling an optically transparent polymeric lid critical for device sealing.

  17. An optimized nanoparticle separator enabled by electron beam induced deposition.

    PubMed

    Fowlkes, J D; Doktycz, M J; Rack, P D

    2010-04-23

    Size-based separations technologies will inevitably benefit from advances in nanotechnology. Direct-write nanofabrication provides a useful mechanism for depositing/etching nanoscale elements in environments otherwise inaccessible to conventional nanofabrication techniques. Here, electron beam induced deposition was used to deposit an array of nanoscale features in a 3D environment with minimal material proximity effects outside the beam-interaction region. Specifically, the membrane component of a nanoparticle separator was fabricated by depositing a linear array of sharply tipped nanopillars, with a singular pitch, designed for sub-50 nm nanoparticle permeability. The nanopillar membrane was used in a dual capacity to control the flow of nanoparticles in the transaxial direction of the array while facilitating the sealing of the cellular-sized compartment in the paraxial direction. An optimized growth recipe resulted which (1) maximized the growth efficiency of the membrane (which minimizes proximity effects) and (2) preserved the fidelity of the spacing between nanopillars (which maximizes the size-based gating quality of the membrane) while (3) maintaining sharp nanopillar apexes for impaling an optically transparent polymeric lid critical for device sealing. PMID:20351412

  18. Nanostructured component fabrication by electron beam-physical vapor deposition

    NASA Astrophysics Data System (ADS)

    Singh, Jogender; Wolfe, Douglas E.

    2005-08-01

    Fabrication of cost-effective, nano-grained net-shaped components has brought considerable interest to Department of Defense, National Aeronautics and Space Administration, and Department of Energy. The objective of this paper is to demonstrate the versatility of electron beam-physical vapor deposition (EB-PVD) technology in engineering new nanostructured materials with controlled microstructure and microchemistry in the form of coatings and net-shaped components for many applications including the space, turbine, optical, biomedical, and auto industries. Coatings are often applied on components to extent their performance and life under severe environmental conditions including thermal, corrosion, wear, and oxidation. Performance and properties of the coatings depend upon their composition, microstructure, and deposition condition. Simultaneous co-evaporation of multiple ingots of different compositions in the high energy EB-PVD chamber has brought considerable interest in the architecture of functional graded coatings, nano-laminated coatings, and design of new structural materials that could not be produced economically by conventional methods. In addition, high evaporation and condensate rates allowed fabricating precision net-shaped components with nanograined microstructure for various applications. Using EB-PVD, nano-grained rhenium (Re) coatings and net-shaped components with tailored microstructure and properties were fabricated in the form of tubes, plates, and Re-coated spherical graphite cores. This paper will also present the results of various metallic and ceramic coatings including chromium, titanium carbide (TiC), titanium diboride (TiB2), hafnium nitride (HfN), titanium-boron-carbonitride (TiBCN), and partially yttria stabilized zirconia (YSZ) TBC coatings deposited by EB-PVD for various applications.

  19. Use of beam deflection to control an electron beam wire deposition process

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M. (Inventor); Hofmeister, William H. (Inventor); Hafley, Robert A. (Inventor)

    2013-01-01

    A method for controlling an electron beam process wherein a wire is melted and deposited on a substrate as a molten pool comprises generating the electron beam with a complex raster pattern, and directing the beam onto an outer surface of the wire to thereby control a location of the wire with respect to the molten pool. Directing the beam selectively heats the outer surface of the wire and maintains the position of the wire with respect to the molten pool. An apparatus for controlling an electron beam process includes a beam gun adapted for generating the electron beam, and a controller adapted for providing the electron beam with a complex raster pattern and for directing the electron beam onto an outer surface of the wire to control a location of the wire with respect to the molten pool.

  20. Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

    NASA Astrophysics Data System (ADS)

    Noh, J. H.; Stanford, M. G.; Lewis, B. B.; Fowlkes, J. D.; Plank, H.; Rack, P. D.

    2014-12-01

    One critical area for the adoption of extreme ultraviolet (EUV) lithography is the development of appropriate mask repair strategies. To this end, we have explored focused electron beam-induced deposition of the ruthenium capping or protective layer. Electron beam-induced deposition (EBID) was used to deposit a ruthenium capping/protective film using the liquid bis(ethylcyclopentyldienyl)ruthenium(II) precursor. The carbon to ruthenium atomic ratio in the as-deposited material was estimated to be ~9/1. Subsequent to deposition, we demonstrate an electron stimulated purification process to remove carbon by-products from the deposit. Results indicate that high-fidelity nanoscale ruthenium repairs can be realized.

  1. Electrochemically Deposited Ceria Structures for Advanced Solid Oxide Fuel Cells

    NASA Astrophysics Data System (ADS)

    Brown, Evan C.

    As the pursuit towards emissions reduction intensifies with growing interest and nascent technologies, solid oxide fuel cells (SOFCs) remain an illustrious candidate for achieving our goals. Despite myriad advantages, SOFCs are still too costly for widespread deployment, even as unprecedented materials developments have recently emerged. This suggests that, in addition to informed materials selection, the necessary power output--and, thereby, cost-savings--gains must come from the fuel cell architecture. The work presented in this manuscript primarily investigates cathodic electrochemical deposition (CELD) as a scalable micro-/nanoscale fabrication tool for engineering ceria-based components in a SOFC assembly. Also, polymer sphere lithography was utilized to deposit fully connected, yet fully porous anti-dot metal films on yttira-stabilized zirconia (YSZ) with specific and knowable geometries, useful for mechanistic studies. Particular attention was given to anode structures, for which anti-dot metal films on YSZ served as composite substrates for subsequent CELD of doped ceria. By tuning the applied potential, a wide range of microstructures from high surface area coatings to planar, thin films was possible. In addition, definitive deposition was shown to occur on the electronically insulating YSZ surfaces, producing quality YSZ|ceria interfaces. These CELD ceria deposits exhibited promising electrochemical activity, as probed by A.C. Impedance Spectroscopy. In an effort to extend its usefulness as a SOFC fabrication tool, the CELD of ceria directly onto common SOFC cathode materials without a metallic phase was developed, as well as templated deposition schemes producing ceria nanowires and inverse opals.

  2. Inert gas jets for growth control in electron beam induced deposition

    SciTech Connect

    Henry, M. R.; Kim, S.; Rykaczewski, K.; Fedorov, A. G.

    2011-06-27

    An inert, precursor free, argon jet is used to control the growth rate of electron beam induced deposition. Adjustment of the jet kinetic energy/inlet temperature can selectively increase surface diffusion to greatly enhance the deposition rate or deplete the surface precursor due to impact-stimulated desorption to minimize the deposition or completely clean the surface. Physical mechanisms for this process are described. While the electron beam is also observed to generate plasma upon interaction with an argon jet, our results indicate that plasma does not substantially contribute to the enhanced deposition rate.

  3. Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

    PubMed Central

    Lewis, Brett B; Stanford, Michael G; Fowlkes, Jason D; Lester, Kevin; Plank, Harald

    2015-01-01

    Summary Platinum–carbon nanostructures deposited via electron beam induced deposition from MeCpPt(IV)Me3 are purified during a post-deposition electron exposure treatment in a localized oxygen ambient at room temperature. Time-dependent studies demonstrate that the process occurs from the top–down. Electron beam energy and current studies demonstrate that the process is controlled by a confluence of the electron energy loss and oxygen concentration. Furthermore, the experimental results are modeled as a 2nd order reaction which is dependent on both the electron energy loss density and the oxygen concentration. In addition to purification, the post-deposition electron stimulated oxygen purification process enhances the resolution of the EBID process due to the isotropic carbon removal from the as-deposited materials which produces high-fidelity shape retention. PMID:25977862

  4. Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

    DOE PAGESBeta

    Lewis, Brett B.; Stanford, Michael G.; Fowlkes, Jason D.; Lester, Kevin; Plank, Harald; Rack, Philip D.

    2015-04-08

    In this paper, platinum–carbon nanostructures deposited via electron beam induced deposition from MeCpPt(IV)Me3 are purified during a post-deposition electron exposure treatment in a localized oxygen ambient at room temperature. Time-dependent studies demonstrate that the process occurs from the top–down. Electron beam energy and current studies demonstrate that the process is controlled by a confluence of the electron energy loss and oxygen concentration. Furthermore, the experimental results are modeled as a 2nd order reaction which is dependent on both the electron energy loss density and the oxygen concentration. Finally, in addition to purification, the post-deposition electron stimulated oxygen purification process enhancesmore » the resolution of the EBID process due to the isotropic carbon removal from the as-deposited materials which produces high-fidelity shape retention.« less

  5. Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

    SciTech Connect

    Lewis, Brett B.; Stanford, Michael G.; Fowlkes, Jason D.; Lester, Kevin; Plank, Harald; Rack, Philip D.

    2015-04-08

    In this paper, platinum–carbon nanostructures deposited via electron beam induced deposition from MeCpPt(IV)Me3 are purified during a post-deposition electron exposure treatment in a localized oxygen ambient at room temperature. Time-dependent studies demonstrate that the process occurs from the top–down. Electron beam energy and current studies demonstrate that the process is controlled by a confluence of the electron energy loss and oxygen concentration. Furthermore, the experimental results are modeled as a 2nd order reaction which is dependent on both the electron energy loss density and the oxygen concentration. Finally, in addition to purification, the post-deposition electron stimulated oxygen purification process enhances the resolution of the EBID process due to the isotropic carbon removal from the as-deposited materials which produces high-fidelity shape retention.

  6. Single-crystal nanowires grown via electron-beam-induced deposition

    SciTech Connect

    Klein, Kate L; Randolph, Steven J; Fowlkes, Jason Davidson; Allard Jr, Lawrence Frederick; Meyer III, Harry M; Simpson, Michael L; Rack, Philip D

    2008-01-01

    Electron-beam-induced deposition (EBID) is a useful technique for direct-writing of 3-dimensional dielectric, semiconductor, and metallic materials with nanoscale precision and resolution. The EBID process, however, has been limited in many cases because precursor byproducts (typically from organic precursors like W(CO)6) are incorporated into the deposited material resulting in contaminated and amorphous structures. In this manuscript, we have investigated the structure and composition of EBID tungsten nanostructures as-deposited from a tungsten hexafluoride (WF6) precursor. High-resolution transmission electron microscopy, electron diffraction and electron spectroscopy were employed to determine the effects that the electron beam scanning conditions have on the deposit characteristics. The results show that slow, one-dimensional lateral scanning produces textured -tungsten nanowire cores surrounded by an oxide secondary layer, while stationary vertical growth leads to single-crystal [100]-oriented W3O nanowires. Furthermore we correlate how the growth kinetics affect the resultant nanowire structure and composition.

  7. Electron-beam-directed vapor deposition of multifunctional structures for electrochemical storage

    NASA Astrophysics Data System (ADS)

    Queheillalt, Douglas T.; Hass, Derek D.; Wadley, Haydn N. G.

    2002-07-01

    Multifunctional structures are those, which combine load- bearing support in addition to additional functions such as mechanical actuation, distributed power supply or thermal management. Electron beam - directed vapor deposition technology has been used to investigate deposition methodologies for two multifunctional battery concepts: a linear/truss base nickel - metal hydride and a fiber based solid-state Li+ ion multifunctional battery. Porous nickel coatings for the cathodes and porous rare earth metal coatings based on La and Ni or Ti and Zr for the anodes are being investigated for the nickel - metal hydride system; where LiV2O5, LiPON, and Sn3N4 are being investigated for the Li+ ion based system. Electron beam - directed vapor deposition is being used for deposition of all cathode/anode structures to provide an economical method for the development of these novel multifunctional structures.

  8. Focused electron beam induced deposition as a tool to create electron vortices.

    PubMed

    Béché, A; Winkler, R; Plank, H; Hofer, F; Verbeeck, J

    2016-01-01

    Focused electron beam induced deposition (FEBID) is a microscopic technique that allows geometrically controlled material deposition with very high spatial resolution. This technique was used to create a spiral aperture capable of generating electron vortex beams in a transmission electron microscope (TEM). The vortex was then fully characterized using different TEM techniques, estimating the average orbital angular momentum to be ∼0.8ℏ per electron with almost 60% of the beam ending up in the ℓ=1 state. PMID:26432987

  9. Inert gas enhanced laser-assisted purification of platinum electron-beam-induced deposits

    SciTech Connect

    Stanford, Michael G.; Lewis, Brett B.; Noh, Joo Hyon; Fowlkes, Jason Davidson; Rack, Philip D.

    2015-06-30

    Electron-beam-induced deposition patterns, with composition of PtC5, were purified using a pulsed laser-induced purification reaction to erode the amorphous carbon matrix and form pure platinum deposits. Enhanced mobility of residual H2O molecules via a localized injection of inert Ar–H2 (4%) is attributed to be the reactive gas species for purification of the deposits. Surface purification of deposits was realized at laser exposure times as low as 0.1 s. The ex situ purification reaction in the deposit interior was shown to be rate-limited by reactive gas diffusion into the deposit, and deposit contraction associated with the purification process caused some loss of shape retention. To circumvent the intrinsic flaws of the ex situ anneal process, in situ deposition and purification techniques were explored that resemble a direct write atomic layer deposition (ALD) process. First, we explored a laser-assisted electron-beam-induced deposition (LAEBID) process augmented with reactive gas that resulted in a 75% carbon reduction compared to standard EBID. Lastly, a sequential deposition plus purification process was also developed and resulted in deposition of pure platinum deposits with high fidelity and shape retention.

  10. Inert gas enhanced laser-assisted purification of platinum electron-beam-induced deposits

    DOE PAGESBeta

    Stanford, Michael G.; Lewis, Brett B.; Noh, Joo Hyon; Fowlkes, Jason Davidson; Rack, Philip D.

    2015-06-30

    Electron-beam-induced deposition patterns, with composition of PtC5, were purified using a pulsed laser-induced purification reaction to erode the amorphous carbon matrix and form pure platinum deposits. Enhanced mobility of residual H2O molecules via a localized injection of inert Ar–H2 (4%) is attributed to be the reactive gas species for purification of the deposits. Surface purification of deposits was realized at laser exposure times as low as 0.1 s. The ex situ purification reaction in the deposit interior was shown to be rate-limited by reactive gas diffusion into the deposit, and deposit contraction associated with the purification process caused some lossmore » of shape retention. To circumvent the intrinsic flaws of the ex situ anneal process, in situ deposition and purification techniques were explored that resemble a direct write atomic layer deposition (ALD) process. First, we explored a laser-assisted electron-beam-induced deposition (LAEBID) process augmented with reactive gas that resulted in a 75% carbon reduction compared to standard EBID. Lastly, a sequential deposition plus purification process was also developed and resulted in deposition of pure platinum deposits with high fidelity and shape retention.« less

  11. Inert Gas Enhanced Laser-Assisted Purification of Platinum Electron-Beam-Induced Deposits.

    PubMed

    Stanford, Michael G; Lewis, Brett B; Noh, Joo Hyon; Fowlkes, Jason D; Rack, Philip D

    2015-09-01

    Electron-beam-induced deposition patterns, with composition of PtC5, were purified using a pulsed laser-induced purification reaction to erode the amorphous carbon matrix and form pure platinum deposits. Enhanced mobility of residual H2O molecules via a localized injection of inert Ar-H2 (4%) is attributed to be the reactive gas species for purification of the deposits. Surface purification of deposits was realized at laser exposure times as low as 0.1 s. The ex situ purification reaction in the deposit interior was shown to be rate-limited by reactive gas diffusion into the deposit, and deposit contraction associated with the purification process caused some loss of shape retention. To circumvent the intrinsic flaws of the ex situ anneal process, in situ deposition and purification techniques were explored that resemble a direct write atomic layer deposition (ALD) process. First, we explored a laser-assisted electron-beam-induced deposition (LAEBID) process augmented with reactive gas that resulted in a 75% carbon reduction compared to standard EBID. A sequential deposition plus purification process was also developed and resulted in deposition of pure platinum deposits with high fidelity and shape retention. PMID:26126173

  12. Metal delocalization and surface decoration in direct-write nanolithography by electron beam induced deposition

    SciTech Connect

    Gopal, Vidyut; Stach, Eric A.; Radmilovic, Velimir R.; Mowat, Ian A.

    2004-07-05

    The ability to interconnect different nanostructures is crucial to nanocircuit fabrication efforts. A simple and versatile direct-write nanolithography technique for the fabrication of interconnects is presented. Decomposition of a metalorganic precursor gas by a focused electron beam resulted in the deposition of conductive platinum nanowires. The combination of in situ secondary electron imaging with deposition allows for the simultaneous identification and interconnection of nanoscale components. However, the deposition was not entirely localized to the electron beam raster area, as shown by secondary ion mass spectrometry measurements. The electrical impact of the metallic spread was quantified by measuring the leakage current between closely spaced wires. The origins of the spread and strategies for minimizing it are discussed. These results indicate that, while this direct-write methodology is a convenient one for rapid prototyping of nanocircuits, caution must be used to avoid unwanted decoration of nanostructures by metallic species.

  13. CNT manipulation: inserting a carbonaceous dielectric layer beneath using electron beam induced deposition.

    PubMed

    Kurrat, Narendra; Vijaykumar, T; Kulkarni, G U

    2011-02-01

    Electron beam induced carbonaceous deposition has been carried out in the presence of water vapor at 0.4 torr pressure amidst residual hydrocarbons present in the SEM chamber. When performed at a CNT location on a Si substrate with low e beam energy (10 kV), the deposition was taking place beneath the CNT. While higher beam energy (25 kV) causing the deposition on the top surface of the CNT, in agreement with the earlier reports. The insertion of dielectric carbonaceous layer beneath the CNT allowed us to measure the I-V data along the length of the nanotube using CAFM. PMID:21456133

  14. Pyramidal growth of ceria nanostructures by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Bârcă, E. S.; Filipescu, M.; Luculescu, C.; Birjega, R.; Ion, V.; Dumitru, M.; Nistor, L. C.; Stanciu, G.; Abrudeanu, M.; Munteanu, C.; Dinescu, M.

    2016-02-01

    We report in this paper on the deposition and characterization of CeO2 nanostructured thin films with hierarchical morphology. Micro-sized ceria powder (CeO2, 99.9% purity) was pressed to obtain a ceramic target. An ArF laser working at 193 nm irradiated the target in controlled oxygen gas flow at constant pressure (0.1 mbar). Silicon wafers used as substrates for thin films were heated at different temperatures, up to 773 K. The influence of substrate temperature on the structure and surface morphology of ceria thin films was studied by X-ray diffraction (XRD), transmission electron microscopy (TEM), Raman spectroscopy and scanning electron microscopy (SEM). The refractive indices and information about roughness and thickness were revealed by spectroellipsometry. Crystalline cubic ceria thin films exhibiting a hierarchical structure that combines columnar and dendritic growth were obtained at temperatures above 473 K. For the samples obtained at 773 K, columns ending in pyramidal formations with sharp edges and sizes of hundreds of nanometers were observed, indicating a high crystallinity of the layer. XRD analysis reveals a consistent increase of the X-ray coherence length/crystallite size along the [111] direction with increasing temperature. Using a semi-empirical formula, Raman crystallites sizes were calculated and it was found that size increases with the temperature increasing. The spectroellipsometry investigations evidenced the increasing of refractive index with the substrate temperature increase. High surface roughness and pyramidal structures were noticed from the atomic force microscopy images for layers deposited at substrate temperature above 473 K.

  15. Electrical characterization of defects introduced in n-Ge during electron beam deposition or exposure

    SciTech Connect

    Coelho, S. M. M.; Auret, F. D.; Janse van Rensburg, P. J.; Nel, J. M.

    2013-11-07

    Schottky barrier diodes prepared by electron beam deposition (EBD) on Sb-doped n-type Ge were characterized using deep level transient spectroscopy (DLTS). Pt EBD diodes manufactured with forming gas in the chamber had two defects, E{sub 0.28} and E{sub 0.31}, which were not previously observed after EBD. By shielding the samples mechanically during EBD, superior diodes were produced with no measureable deep levels, establishing that energetic ions created in the electron beam path were responsible for the majority of defects observed in the unshielded sample. Ge samples that were first exposed to the conditions of EBD, without metal deposition (called electron beam exposure herein), introduced a number of new defects not seen after EBD with only the E-center being common to both processes. Substantial differences were noted when these DLTS spectra were compared to those obtained using diodes irradiated by MeV electrons or alpha particles indicating that very different defect creation mechanisms are at play when too little energy is available to form Frenkel pairs. These observations suggest that when EBD ions and energetic particles collide with the sample surface, inducing intrinsic non-localised lattice excitations, they modify defects deeper in the semiconductor thus rendering them observable.

  16. Enhanced material purity and resolution via synchronized laser assisted electron beam induced deposition of platinum.

    PubMed

    Roberts, Nicholas A; Fowlkes, Jason D; Magel, Gregory A; Rack, Philip D

    2013-01-01

    We introduce a laser assisted electron beam induced deposition (LAEBID) process which is a nanoscale direct write synthesis method that integrates an electron beam induced deposition process with a synchronized pulsed laser step to induce thermal desorption of reaction by-products. Localized, spatially overlapping electron and photon pulses enable the thermal desorption of the reaction by-product while mitigating issues associated with bulk substrate heating, which can shorten the precursor residence time and distort pattern fidelity due to thermal drift. Current results demonstrate purification of platinum deposits (reduced carbon content by ~50%) with the addition of synchronized laser pulses as well as a significant reduction in deposit resistivity. Measured resistivities from platinum LAEBID structures (4 × 10(3)μΩ cm) are nearly 4 orders of magnitude lower than standard EBID platinum structures (2.2 × 10(7)μΩ cm) from the same precursor and are lower than the lowest reported EBID platinum resistivity with post-deposition annealing (1.4 × 10(4)μΩ cm). Finally the LAEBID process demonstrates improved deposit resolution by ~25% compared to EBID structures under the conditions investigated in this work. PMID:23184056

  17. Review of magnetic nanostructures grown by focused electron beam induced deposition (FEBID)

    NASA Astrophysics Data System (ADS)

    De Teresa, J. M.; Fernández-Pacheco, A.; Córdoba, R.; Serrano-Ramón, L.; Sangiao, S.; Ibarra, M. R.

    2016-06-01

    We review the current status of the use of focused electron beam induced deposition (FEBID) for the growth of magnetic nanostructures. This technique relies on the local dissociation of a precursor gas by means of an electron beam. The most promising results have been obtained using the Co2(CO)8 precursor, where the Co content in the grown nanodeposited material can be tailored up to more than 95 at.%. Functional behaviour of these Co nanodeposits has been observed in applications such as arrays of magnetic dots for information storage and catalytic growth, magnetic tips for scanning probe microscopes, nano-Hall sensors for bead detection, nano-actuated magnetomechanical systems and nanowires for domain-wall manipulation. The review also covers interesting results observed in Fe-based and alloyed nanodeposits. Advantages and disadvantages of FEBID for the growth of magnetic nanostructures are discussed in the article as well as possible future directions in this field.

  18. Origin and control of magnetic exchange coupling in between focused electron beam deposited cobalt nanostructures

    SciTech Connect

    Nikulina, E.; Idigoras, O.; Porro, J. M.; Berger, A.; Vavassori, P.; Chuvilin, A.; Ikerbasque, Basque Foundation for Science, Alameda Urquijo 36-5, 48011 Bilbao

    2013-09-16

    We demonstrate the existence and control of inter-particle magnetic exchange coupling in densely packed nanostructures fabricated by focused electron beam induced deposition. With Xe beam post-processing, we have achieved the controlled reduction and eventual elimination of the parasitic halo-like cobalt deposits formed in the proximity of intended nanostructures, which are the identified source of the magnetic exchange coupling. The elimination of the halo-mediated exchange coupling is demonstrated by magnetic measurements using Kerr microscopy on Co pillar arrays. Electron microscopy studies allowed us to identify the mechanisms underlying this process and to verify the efficiency and opportunities of the described nano-scale fabrication approach.

  19. Texture-Induced Anisotropy in an Inconel 718 Alloy Deposited Using Electron Beam Freeform Fabrication

    NASA Technical Reports Server (NTRS)

    Tayon, W.; Shenoy, R.; Bird, R.; Hafley, R.; Redding, M.

    2014-01-01

    A test block of Inconel (IN) 718 was fabricated using electron beam freeform fabrication (EBF(sup 3)) to examine how the EBF(sup 3) deposition process affects the microstructure, crystallographic texture, and mechanical properties of IN 718. Tests revealed significant anisotropy in the elastic modulus for the as-deposited IN 718. Subsequent tests were conducted on specimens subjected to a heat treatment designed to decrease the level of anisotropy. Electron backscatter diffraction (EBSD) was used to characterize crystallographic texture in the as-deposited and heat treated conditions. The anisotropy in the as-deposited condition was strongly affected by texture as evidenced by its dependence on orientation relative to the deposition direction. Heat treatment resulted in a significant improvement in modulus of the EBF(sup 3) product to a level nearly equivalent to that for wrought IN 718 with reduced anisotropy; reduction in texture through recrystallization; and production of a more homogeneous microstructure.

  20. Dispersive ground plane core-shell type optical monopole antennas fabricated with electron beam induced deposition.

    PubMed

    Acar, Hakkı; Coenen, Toon; Polman, Albert; Kuipers, Laurens Kobus

    2012-09-25

    We present the bottom-up fabrication of dispersive silica core, gold cladding ground plane optical nanoantennas. The structures are made by a combination of electron-beam induced deposition of silica and sputtering of gold. The antenna lengths range from 300 to 2100 nm with size aspect ratios as large as 20. The angular emission patterns of the nanoantennas are measured with angle-resolved cathodoluminescence spectroscopy and compared with finite-element methods. Good overall correspondence between the the measured and calculated trends is observed. The dispersive nature of these plasmonic monopole antennas makes their radiation profile highly tunable. PMID:22889269

  1. Site control technique for quantum dots using electron beam induced deposition

    SciTech Connect

    Iizuka, Kanji; Jung, JaeHun; Yokota, Hiroshi

    2014-05-15

    To develop simple and high throughput sit definition technique for quantum dots (QDs), the electron beam induced deposition (EBID) method was used as desorption guide of phosphorus atoms form InP substrate. As the results one or a few indium (In) droplets (DLs) were created in the carbon grid pattern by thermal annealing at a temperature of 450°C for 10 min in the ultra high vacuum condition. The size of In DLs was larger than QDs, but arsenide DLs by molecular beam in growth chamber emitted wavelength of 1.028μm at 50K by photoluminescence measurement.

  2. Site control technique for quantum dots using electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    Iizuka, Kanji; Jung, JaeHun; Yokota, Hiroshi

    2014-05-01

    To develop simple and high throughput sit definition technique for quantum dots (QDs), the electron beam induced deposition (EBID) method was used as desorption guide of phosphorus atoms form InP substrate. As the results one or a few indium (In) droplets (DLs) were created in the carbon grid pattern by thermal annealing at a temperature of 450°C for 10 min in the ultra high vacuum condition. The size of In DLs was larger than QDs, but arsenide DLs by molecular beam in growth chamber emitted wavelength of 1.028μm at 50K by photoluminescence measurement.

  3. Processing-structure-property relationships in electron beam physical vapor deposited yttria stabilized zirconia coatings

    SciTech Connect

    Rao, D. Srinivasa; Valleti, Krishna; Joshi, S. V.; Janardhan, G. Ranga

    2011-05-15

    The physical and mechanical properties of yttria stabilized zirconia (YSZ) coatings deposited by the electron beam physical vapor deposition technique have been investigated by varying the key process variables such as vapor incidence angle and sample rotation speed. The tetragonal zirconia coatings formed under varying process conditions employed were found to have widely different surface and cross-sectional morphologies. The porosity, phase composition, planar orientation, hardness, adhesion, and surface residual stresses in the coated specimens were comprehensively evaluated to develop a correlation with the process variables. Under transverse scratch test conditions, the YSZ coatings exhibited two different crack formation modes, depending on the magnitude of residual stress. The influence of processing conditions on the coating deposition rate, column orientation angle, and adhesion strength has been established. Key relationships between porosity, hardness, and adhesion are also presented.

  4. Unveiling the optical properties of a metamaterial synthesized by electron-beam-induced deposition.

    PubMed

    Woźniak, P; Höflich, K; Brönstrup, G; Banzer, P; Christiansen, S; Leuchs, G

    2016-01-15

    Direct writing using a focused electron beam allows for fabricating truly three-dimensional structures of sub-wavelength dimensions in the visible spectral regime. The resulting sophisticated geometries are perfectly suited for studying light-matter interaction at the nanoscale. Their overall optical response will strongly depend not only on geometry but also on the optical properties of the deposited material. In the case of the typically used metal-organic precursors, the deposits show a substructure of metallic nanocrystals embedded in a carbonaceous matrix. Since gold-containing precursor media are especially interesting for optical applications, we experimentally determine the effective permittivity of such an effective material. Our experiment is based on spectroscopic measurements of planar deposits. The retrieved permittivity shows a systematic dependence on the gold particle density and cannot be sufficiently described using the common Maxwell-Garnett approach for effective medium. PMID:26629782

  5. Unveiling the optical properties of a metamaterial synthesized by electron-beam-induced deposition

    NASA Astrophysics Data System (ADS)

    Woźniak, P.; Höflich, K.; Brönstrup, G.; Banzer, P.; Christiansen, S.; Leuchs, G.

    2016-01-01

    Direct writing using a focused electron beam allows for fabricating truly three-dimensional structures of sub-wavelength dimensions in the visible spectral regime. The resulting sophisticated geometries are perfectly suited for studying light-matter interaction at the nanoscale. Their overall optical response will strongly depend not only on geometry but also on the optical properties of the deposited material. In the case of the typically used metal-organic precursors, the deposits show a substructure of metallic nanocrystals embedded in a carbonaceous matrix. Since gold-containing precursor media are especially interesting for optical applications, we experimentally determine the effective permittivity of such an effective material. Our experiment is based on spectroscopic measurements of planar deposits. The retrieved permittivity shows a systematic dependence on the gold particle density and cannot be sufficiently described using the common Maxwell-Garnett approach for effective medium.

  6. Electron-Beam-Induced Deposition as a Technique for Analysis of Precursor Molecule Diffusion Barriers and Prefactors.

    PubMed

    Cullen, Jared; Lobo, Charlene J; Ford, Michael J; Toth, Milos

    2015-09-30

    Electron-beam-induced deposition (EBID) is a direct-write chemical vapor deposition technique in which an electron beam is used for precursor dissociation. Here we show that Arrhenius analysis of the deposition rates of nanostructures grown by EBID can be used to deduce the diffusion energies and corresponding preexponential factors of EBID precursor molecules. We explain the limitations of this approach, define growth conditions needed to minimize errors, and explain why the errors increase systematically as EBID parameters diverge from ideal growth conditions. Under suitable deposition conditions, EBID can be used as a localized technique for analysis of adsorption barriers and prefactors. PMID:26340502

  7. Thermally induced transformations of amorphous carbon nanostructures fabricated by electron beam induced deposition.

    PubMed

    Kulkarni, Dhaval D; Rykaczewski, Konrad; Singamaneni, Srikanth; Kim, Songkil; Fedorov, Andrei G; Tsukruk, Vladimir V

    2011-03-01

    We studied the thermally induced phase transformations of electron-beam-induced deposited (EBID) amorphous carbon nanostructures by correlating the changes in its morphology with internal microstructure by using combined atomic force microscopy (AFM) and high resolution confocal Raman microscopy. These carbon deposits can be used to create heterogeneous junctions in electronic devices commonly known as carbon-metal interconnects. We compared two basic shapes of EBID deposits: dots/pillars with widths from 50 to 600 nm and heights from 50 to 500 nm and lines with variable heights from 10 to 150 nm but having a constant length of 6 μm. We observed that during thermal annealing, the nanoscale amorphous deposits go through multistage transformation including dehydration and stress-relaxation around 150 °C, dehydrogenation within 150-300 °C, followed by graphitization (>350 °C) and formation of nanocrystalline, highly densified graphitic deposits around 450 °C. The later stage of transformation occurs well below commonly observed graphitization for bulk carbon (600-800 °C). It was observed that the shape of the deposits contribute significantly to the phase transformations. We suggested that this difference is controlled by different contributions from interfacial footprints area. Moreover, the rate of graphitization was different for deposits of different shapes with the lines showing a much stronger dependence of its structure on the density than the dots. PMID:21319745

  8. TOPICAL REVIEW: Fabrication and characterization of nanostructures on insulator substrates by electron-beam-induced deposition

    NASA Astrophysics Data System (ADS)

    Song, Minghui; Furuya, Kazuo

    2008-04-01

    The fabrication, characterization, and decoration with metallic nanoparticles of nanostructures such as nanowhiskers, nanodendrites, and fractal-like nanotrees on insulator substrates by electron-beam-induced deposition (EBID) are reviewed. Nanostructures with different morphologies of whiskers, dendrites, or trees are fabricated on insulator (Al2O3 or SiO2) substrates by EBID in transmission electron microscopes by controlling the irradiation conditions such as the electron beam intensity. The growth of the nanostructure is related to the accumulation of charges on the surface of a substrate during electron-beam irradiation. A high concentration of the target metallic element and nanocrystal grains of the element are contained in the fabricated nanostructures. The process of growth of the nanostructures is explained qualitatively on the basis of mechanisms in which the formation of the nanostructures is considered to be related to the nanoscaled unevenness of the charge distribution on the surface of the substrate, the movement of the charges to the convex surface of the substrate, and the accumulation of charges at the tip of the grown nanostructure. Novel composite structures of Pt nanoparticle/tungsten (W) nanodendrite or Au nanoparticle/W nanodendrite are fabricated by the decoration of W nanodendrites with metallic elements. Because they have superior features, such as a large specific surface area, a freestanding structure on substrates, a typical size of several nanometers of the tip or the branch, and high purity, the nanostructures may have applications in technologies such as catalysts, sensors, and electron emitters. However, there are still some subjects that should be further studied before their application.

  9. Study And Comparison Of Silver Mirrors Deposited On Different Substrates By Electron-Beam Gun Method

    SciTech Connect

    Asl, Jahanbakhsh Mashaiekhy; Shafieizadeh, Zahra; Sabbaghzadeh, Jamshid; Anaraki, Mahdi

    2010-12-23

    Choosing the right substrate is one of the important factors for improving quality parameters of thin films such as adhesion between layers and substrates. The selected substrate should have proper physical and chemical compatibility with deposited thin film. In this paper, we have been investigated four different types of high reflective laser mirrors that were produced in similar conditions on four different kinds of substrates including copper, stainless steel, brass, and nickel. We used electron-beam gun method for deposition of silver layers. At the end we compared theoretical results with practical results that were yielded by laser damage threshold test. It was shown that brass is the best choice for silver metal mirrors as a substrate.

  10. Lung deposition and extrapulmonary translocation of nano-ceria after intratracheal instillation

    NASA Astrophysics Data System (ADS)

    He, Xiao; Zhang, Haifeng; Ma, Yuhui; Bai, Wei; Zhang, Zhiyong; Lu, Kai; Ding, Yayun; Zhao, Yuliang; Chai, Zhifang

    2010-07-01

    The broad potential applications of manufactured nanomaterials call for urgent assessment of their environmental and biological safety. However, most of the previous work focused on the cell level performance; little was known about the consequences of nanomaterial exposure at the whole-body and organ levels. In the present paper, the radiotracer technique was employed to study the pulmonary deposition and the translocation to secondary target organs after ceria nanoparticles (nano-ceria) were intratracheally instilled into Wistar rats. It was found that 63.9 ± 8.2% of the instilled nano-ceria remained in the lung by 28 d postexposure and the elimination half-life was 103 d. At the end of the test period, only 1/8-1/3 of the daily elimination of nano-ceria from the lung was cleared via the gastrointestinal tract, suggesting that phagocytosis by alveolar macrophages (AMs) with subsequent removal towards the larynx was no longer the predominant route for the elimination of nano-ceria from the lung. The whole-body redistribution of nano-ceria demonstrated that the deposited nano-ceria could penetrate through the alveolar wall into the systemic circulation and accumulate in the extrapulmonary organs. In vitro study suggested that nano-ceria would agglomerate and form sediments in the bronchoalveolar aqueous surrounding while binding to protein would be conducive to the redispersion of nano-ceria. The decrease in the size of agglomerates might enhance the penetration of nano-ceria into the systemic circulation. Our findings suggested that the effect of nanomaterial exposure, even at low concentration, should be assessed because of the potential lung and systemic cumulative toxicity of the nanomaterials.

  11. Closed-Loop Process Control for Electron Beam Freeform Fabrication and Deposition Processes

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M. (Inventor); Hafley, Robert A. (Inventor); Martin, Richard E. (Inventor); Hofmeister, William H. (Inventor)

    2013-01-01

    A closed-loop control method for an electron beam freeform fabrication (EBF(sup 3)) process includes detecting a feature of interest during the process using a sensor(s), continuously evaluating the feature of interest to determine, in real time, a change occurring therein, and automatically modifying control parameters to control the EBF(sup 3) process. An apparatus provides closed-loop control method of the process, and includes an electron gun for generating an electron beam, a wire feeder for feeding a wire toward a substrate, wherein the wire is melted and progressively deposited in layers onto the substrate, a sensor(s), and a host machine. The sensor(s) measure the feature of interest during the process, and the host machine continuously evaluates the feature of interest to determine, in real time, a change occurring therein. The host machine automatically modifies control parameters to the EBF(sup 3) apparatus to control the EBF(sup 3) process in a closed-loop manner.

  12. Spatial chemistry evolution during focused electron beam-induced deposition: origins and workarounds

    NASA Astrophysics Data System (ADS)

    Winkler, Robert; Geier, Barbara; Plank, Harald

    2014-12-01

    The successful application of functional nanostructures, fabricated via focused electron-beam-induced deposition (FEBID), is known to depend crucially on its chemistry as FEBID tends to strong incorporation of carbon. Hence, it is essential to understand the underlying mechanisms which finally determine the elemental composition after fabrication. In this study we focus on these processes from a fundamental point of view by means of (1) varying electron emission on the deposit surface; and (2) changing replenishment mechanism, both driven by the growing deposit itself. First, we revisit previous results concerning chemical variations in nanopillars (with a quasi-1D footprint) depending on the process parameters. In a second step we expand the investigations to deposits with a 3D footprint which are more relevant in the context of applications. Then, we demonstrate how technical setups and directional gas fluxes influence final chemistries. Finally, we put the findings in a bigger context with respect to functionalities which demonstrates the crucial importance of carefully set up fabrication processes to achieve controllable, predictable and reproducible chemistries for FEBID deposits as a key element for industrially oriented applications.

  13. REFLEX: An energy deposition code that models the effects of electron reflection during electron beam heating tests

    SciTech Connect

    Stone, C.A. IV; Croessmann, C.D.; Whitley, J.B.

    1988-01-01

    This report describes an energy coupling model that considers electron reflection losses during electron beam heating experiments. This model is embodied on the REFLEX computer code, written in standard FORTRAN 77. REFLEX currently models energy deposition phenomena in three different sample geometries. These configurations include flat, cylindrical shell, and hemispherical shell surfaces. Given the electron beam operating parameters, REFLEX calculates the heat flux profile over a sample's surface, the total amount of energy deposited into a sample, and the percentage of the electron beam energy that is transferred to a sample. This document describes the energy deposition equations used in the REFLEX code; the program is described and detailed instructions are given regarding the input. Results are given for each geometry and possible experimental applications are presented. 3 refs., 20 figs., 11 tabs.

  14. Focused-electron-beam-induced-deposited cobalt nanopillars for nanomagnetic logic

    NASA Astrophysics Data System (ADS)

    Sharma, N.; van Mourik, R. A.; Yin, Y.; Koopmans, B.; Parkin, S. S. P.

    2016-04-01

    Nanomagnetic logic (NML) intends to alleviate problems of continued miniaturization of CMOS-based electronics, such as energy dissipation through heat, through advantages such as low power operation and non-volatile magnetic elements. In line with recent breakthroughs in NML with perpendicularly magnetized elements formed from thin films, we have fabricated NML inverter chains from Co nanopillars by focused electron beam induced deposition (FEBID) that exhibit shape-induced perpendicular magnetization. The flexibility of FEBID allows optimization of NML structures. Simulations reveal that the choice of nanopillar dimensions is critical to obtain the correct antiferromagnetically coupled configuration. Experiments carrying the array through a clocking cycle using the Oersted field from an integrated Cu wire show that the array responds to the clocking cycle.

  15. Thermal Conductivity Measurement of an Electron-Beam Physical-Vapor-Deposition Coating

    PubMed Central

    Slifka, A. J.; Filla, B. J.

    2003-01-01

    An industrial ceramic thermal-barrier coating designated PWA 266, processed by electron-beam physical-vapor deposition, was measured using a steady-state thermal conductivity technique. The thermal conductivity of the mass fraction 7 % yttria-stabilized zirconia coating was measured from 100 °C to 900 °C. Measurements on three thicknesses of coatings, 170 μm, 350 μm, and 510 μm resulted in thermal conductivity in the range from 1.5 W/(m·K) to 1.7 W/(m·K) with a combined relative standard uncertainty of 20 %. The thermal conductivity is not significantly dependent on temperature.

  16. Focused-electron-beam-induced-deposited cobalt nanopillars for nanomagnetic logic.

    PubMed

    Sharma, N; van Mourik, R A; Yin, Y; Koopmans, B; Parkin, S S P

    2016-04-22

    Nanomagnetic logic (NML) intends to alleviate problems of continued miniaturization of CMOS-based electronics, such as energy dissipation through heat, through advantages such as low power operation and non-volatile magnetic elements. In line with recent breakthroughs in NML with perpendicularly magnetized elements formed from thin films, we have fabricated NML inverter chains from Co nanopillars by focused electron beam induced deposition (FEBID) that exhibit shape-induced perpendicular magnetization. The flexibility of FEBID allows optimization of NML structures. Simulations reveal that the choice of nanopillar dimensions is critical to obtain the correct antiferromagnetically coupled configuration. Experiments carrying the array through a clocking cycle using the Oersted field from an integrated Cu wire show that the array responds to the clocking cycle. PMID:26941232

  17. Selective atomic layer deposition with electron-beam patterned self-assembled monolayers

    SciTech Connect

    Huang, Jie; Lee, Mingun; Kim, Jiyoung

    2012-01-15

    The authors selectively deposited nanolines of titanium oxide (TiO{sub 2}) through atomic layer deposition (ALD) using an octadecyltrichlorosilane (OTS) self-assembled monolayer (SAM) as a nucleation inhibition layer. Electron-beam (e-beam) patterning is used to prepare nanoline patterns in the OTS SAM on SiO{sub 2}/Si substrates suitable for selective ALD. The authors have investigated the effect of an e-beam dose on the pattern width of the selectively deposited TiO{sub 2} lines. A high dose (e.g., 20 nC/cm) causes broadening of the linewidth possibly due to scattering, while a low dose (e.g., 5 nC/cm) results in a low TiO{sub 2} deposition rate because of incomplete exposure of the OTS SAMs. The authors have confirmed that sub-30 nm isolated TiO{sub 2} lines can be achieved by selective ALD combined with OTS patterned by EBL at an accelerating voltage of 2 kV and line dose of 10 nC/cm. This research offers a new approach for patterned gate dielectric layer fabrication, as well as potential applications for nanosensors and solar cells.

  18. Substrate effects on the electron-beam-induced deposition of platinum from a liquid precursor

    NASA Astrophysics Data System (ADS)

    Donev, Eugenii U.; Schardein, Gregory; Wright, John C.; Hastings, J. Todd

    2011-07-01

    Focused electron-beam-induced deposition using bulk liquid precursors (LP-EBID) is a new nanofabrication technique developed in the last two years as an alternative to conventional EBID, which utilizes cumbersome gaseous precursors. Furthermore, LP-EBID using dilute aqueous precursors has been demonstrated to yield platinum (Pt) nanostructures with as-deposited metal content that is substantially higher than the purity achieved by EBID with currently available gaseous precursors. This advantage of LP-EBID--along with the ease of use, low cost, and relative innocuousness of the liquid precursors--holds promise for its practical applicability in areas such as rapid device prototyping and lithographic mask repair. One of the feasibility benchmarks for the LP-EBID method is the ability to deposit high-fidelity nanostructures on various substrate materials. In this study, we report the first observations of performing LP-EBID on bare and metal-coated silicon-nitride membranes, and compare the resulting Pt deposits to those obtained by LP-EBID on polyimide membranes in terms of nucleation, morphology, size dependence on electron dose, and purity.

  19. Substrate effects on the electron-beam-induced deposition of platinum from a liquid precursor.

    PubMed

    Donev, Eugenii U; Schardein, Gregory; Wright, John C; Hastings, J Todd

    2011-07-01

    Focused electron-beam-induced deposition using bulk liquid precursors (LP-EBID) is a new nanofabrication technique developed in the last two years as an alternative to conventional EBID, which utilizes cumbersome gaseous precursors. Furthermore, LP-EBID using dilute aqueous precursors has been demonstrated to yield platinum (Pt) nanostructures with as-deposited metal content that is substantially higher than the purity achieved by EBID with currently available gaseous precursors. This advantage of LP-EBID--along with the ease of use, low cost, and relative innocuousness of the liquid precursors--holds promise for its practical applicability in areas such as rapid device prototyping and lithographic mask repair. One of the feasibility benchmarks for the LP-EBID method is the ability to deposit high-fidelity nanostructures on various substrate materials. In this study, we report the first observations of performing LP-EBID on bare and metal-coated silicon-nitride membranes, and compare the resulting Pt deposits to those obtained by LP-EBID on polyimide membranes in terms of nucleation, morphology, size dependence on electron dose, and purity. PMID:21373685

  20. Structural transitions in electron beam deposited Co-carbonyl suspended nanowires at high electrical current densities.

    PubMed

    Gazzadi, Gian Carlo; Frabboni, Stefano

    2015-01-01

    Suspended nanowires (SNWs) have been deposited from Co-carbonyl precursor (Co2(CO)8) by focused electron beam induced deposition (FEBID). The SNWs dimensions are about 30-50 nm in diameter and 600-850 nm in length. The as-deposited material has a nanogranular structure of mixed face-centered cubic (FCC) and hexagonal close-packed (HCP) Co phases, and a composition of 80 atom % Co, 15 atom % O and 5 atom % C, as revealed by transmission electron microscopy (TEM) analysis and by energy-dispersive X-ray (EDX) spectroscopy, respectively. Current (I)-voltage (V) measurements with current densities up to 10(7) A/cm(2) determine different structural transitions in the SNWs, depending on the I-V history. A single measurement with a sudden current burst leads to a polycrystalline FCC Co structure extended over the whole wire. Repeated measurements at increasing currents produce wires with a split structure: one half is polycrystalline FCC Co and the other half is graphitized C. The breakdown current density is found at 2.1 × 10(7) A/cm(2). The role played by resistive heating and electromigration in these transitions is discussed. PMID:26199833

  1. The electron beam deposition of titanium on polyetheretherketone (PEEK) and the resulting enhanced biological properties.

    PubMed

    Han, Cheol-Min; Lee, Eun-Jung; Kim, Hyoun-Ee; Koh, Young-Hag; Kim, Keung N; Ha, Yoon; Kuh, Sung-Uk

    2010-05-01

    The surface of polyetheretherketone (PEEK) was coated with a pure titanium (Ti) layer using an electron beam (e-beam) deposition method in order to enhance its biocompatibility and adhesion to bone tissue. The e-beam deposition method was a low-temperature coating process that formed a dense, uniform and well crystallized Ti layer without deteriorating the characteristics of the PEEK implant. The Ti coating layer strongly adhered to the substrate and remarkably enhanced its wettability. The Ti-coated samples were evaluated in terms of their in vitro cellular behaviors and in vivo osteointegration, and the results were compared to a pure PEEK substrate. The level of proliferation of the cells (MC3T3-E1) was measured using a methoxyphenyl tetrazolium salt (MTS) assay and more than doubled after the Ti coating. The differentiation level of cells was measured using the alkaline phosphatase (ALP) assay and also doubled. Furthermore, the in vivo animal tests showed that the Ti-coated PEEK implants had a much higher bone-in-contact (BIC) ratio than the pure PEEK implants. These in vitro and in vivo results suggested that the e-beam deposited Ti coating significantly improved the potential of PEEK for hard tissue applications. PMID:20153890

  2. Post-growth purification of Co nanostructures prepared by focused electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    Begun, E.; Dobrovolskiy, O. V.; Kompaniiets, M.; Sachser, R.; Gspan, Ch; Plank, H.; Huth, M.

    2015-02-01

    In the majority of cases nanostructures prepared by focused electron beam induced deposition (FEBID) employing an organometallic precursor contain predominantly carbon-based ligand dissociation products. This is unfortunate with regard to using this high-resolution direct-write approach for the preparation of nanostructures for various fields, such as mesoscopic physics, micromagnetism, electronic correlations, spin-dependent transport and numerous applications. Here we present an in situ cleaning approach to obtain pure Co-FEBID nanostructures. The purification procedure lies in the exposure of heated samples to a H2 atmosphere in conjunction with the irradiation by low-energy electrons. The key finding is that the combination of annealing at 300 °C, H2 exposure and electron irradiation leads to compact, carbon- and oxygen free Co layers down to a thickness of about 20 nm starting from as-deposited Co-FEBID structures. In addition to this, in temperature-dependent electrical resistance measurements on post-processed samples we find a typical metallic behavior. In low-temperature magnetoresistance and Hall effect measurements we observe ferromagnetic behavior.

  3. Simulation-Guided 3D Nanomanufacturing via Focused Electron Beam Induced Deposition

    DOE PAGESBeta

    Fowlkes, Jason D.; Winkler, Robert; Lewis, Brett B.; Stanford, Michael G.; Plank, Harald; Rack, Philip D.

    2016-06-10

    Focused electron beam induced deposition (FEBID) is one of the few techniques that enables direct-write synthesis of free-standing 3D nanostructures. While the fabrication of simple architectures such as vertical or curving nanowires has been achieved by simple trial and error, processing complex 3D structures is not tractable with this approach. This is due, inpart, to the dynamic interplay between electron–solid interactions and the transient spatial distribution of absorbed precursor molecules on the solid surface. Here, we demonstrate the ability to controllably deposit 3D lattice structures at the micro/nanoscale, which have received recent interest owing to superior mechanical and optical properties.more » Moreover, a hybrid Monte Carlo–continuum simulation is briefly overviewed, and subsequently FEBID experiments and simulations are directly compared. Finally, a 3D computer-aided design (CAD) program is introduced, which generates the beam parameters necessary for FEBID by both simulation and experiment. In using this approach, we demonstrate the fabrication of various 3D lattice structures using Pt-, Au-, and W-based precursors.« less

  4. Three-dimensional core–shell ferromagnetic nanowires grown by focused electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    Pablo-Navarro, Javier; Magén, César; María de Teresa, José

    2016-07-01

    Functional nanostructured materials often rely on the combination of more than one material to confer the desired functionality or an enhanced performance of the device. Here we report the procedure to create nanoscale heterostructured materials in the form of core–shell nanowires by focused electron beam induced deposition (FEBID) technologies. In our case, three-dimensional (3D) nanowires (<100 nm in diameter) with metallic ferromagnetic cores of Co- and Fe-FEBID have been grown and coated with a protective Pt-FEBID shell (ranging 10–20 nm in thickness) aimed to minimize the degradation of magnetic properties caused by the surface oxidation of the core to a non-ferromagnetic material. The structure, chemistry and magnetism of nanowire cores of Co and Fe have been characterized in Pt-coated and uncoated nanostructures to demonstrate that the morphology of the shell is conserved during Pt coating, the surface oxidation is suppressed or confined to the Pt layer, and the average magnetization of the core is strengthened up to 30%. The proposed approach paves the way to the fabrication of 3D FEBID nanostructures based on the smart alternate deposition of two or more materials combining different physical properties or added functionalities.

  5. Simulation-Guided 3D Nanomanufacturing via Focused Electron Beam Induced Deposition.

    PubMed

    Fowlkes, Jason D; Winkler, Robert; Lewis, Brett B; Stanford, Michael G; Plank, Harald; Rack, Philip D

    2016-06-28

    Focused electron beam induced deposition (FEBID) is one of the few techniques that enables direct-write synthesis of free-standing 3D nanostructures. While the fabrication of simple architectures such as vertical or curving nanowires has been achieved by simple trial and error, processing complex 3D structures is not tractable with this approach. In part, this is due to the dynamic interplay between electron-solid interactions and the transient spatial distribution of absorbed precursor molecules on the solid surface. Here, we demonstrate the ability to controllably deposit 3D lattice structures at the micro/nanoscale, which have received recent interest owing to superior mechanical and optical properties. A hybrid Monte Carlo-continuum simulation is briefly overviewed, and subsequently FEBID experiments and simulations are directly compared. Finally, a 3D computer-aided design (CAD) program is introduced, which generates the beam parameters necessary for FEBID by both simulation and experiment. Using this approach, we demonstrate the fabrication of various 3D lattice structures using Pt-, Au-, and W-based precursors. PMID:27284689

  6. Synthesis of individually tuned nanomagnets for Nanomagnet Logic by direct write focused electron beam induced deposition.

    PubMed

    Gavagnin, Marco; Wanzenboeck, Heinz D; Belić, Domagoj; Bertagnolli, Emmerich

    2013-01-22

    Nanomagnet Logic (NML) is a promising new technology for future logic which exploits interactions among magnetic nanoelements in order to encode and compute binary information. This approach overcomes the well-known limits of CMOS-based microelectronics by drastically reducing the power consumption of computational systems and by offering nonvolatility. An actual key challenge is the nanofabrication of such systems that, up to date, are prepared by complex multistep processes in planar technology. Here, we report the single-step synthesis of NML key elements by focused electron beam induced deposition (FEBID) using iron pentacarbonyl as a gas precursor. The resulting nanomagnets feature an inner iron part and a 3 nm iron oxide cover (core-shell structure). Full functionality of conventional NML gates from FEBID-nanowires was achieved. An advanced structure maintaining the gate functionality based on bended nanowires was realized. The unique design obtained by direct-writing reduces the error probability and may merge several NWs in future NML elements. PMID:23227975

  7. Visible light active TiO 2 films prepared by electron beam deposition of noble metals

    NASA Astrophysics Data System (ADS)

    Hou, Xing-Gang; Ma, Jun; Liu, An-Dong; Li, De-Jun; Huang, Mei-Dong; Deng, Xiang-Yun

    2010-03-01

    TiO 2 films prepared by sol-gel method were modified by electron beam deposition of noble metals (Pt, Pd, and Ag). Effects of noble metals on the chemical and surface characteristics of the films were studied using XPS, TEM and UV-Vis spectroscopy techniques. Photocatalytic activity of modified TiO 2 films was evaluated by studying the degradation of methyl orange dye solution under visible light UV irradiation. The result of TEM reveals that most of the surface area of TiO 2 is covered by tiny particles of noble metals with diameter less than 1 nm. Broad red shift of UV-Visible absorption band of modified photocatalysts was observed. The catalytic degradation of methyl orange in aqueous solutions under visible light illumination demonstrates a significant enhancement of photocatalytic activity of these films compared with the un-loaded films. The photocatalytic efficiency of modified TiO 2 films by this method is affected by the concentration of impregnating solution.

  8. Electron-beam-induced deposition and post-treatment processes to locally generate clean titanium oxide nanostructures on Si(100).

    PubMed

    Schirmer, M; Walz, M-M; Vollnhals, F; Lukasczyk, T; Sandmann, A; Chen, C; Steinrück, H-P; Marbach, H

    2011-02-25

    We have investigated the lithographic generation of TiO(x) nanostructures on Si(100) via electron-beam-induced deposition (EBID) of titanium tetraisopropoxide (TTIP) in ultra-high vacuum (UHV) by scanning electron microscopy (SEM) and local Auger electron spectroscopy (AES). In addition, the fabricated nanostructures were also characterized ex situ via atomic force microscopy (AFM) under ambient conditions. In EBID, a highly focused electron beam is used to locally decompose precursor molecules and thereby to generate a deposit. A drawback of this nanofabrication technique is the unintended deposition of material in the vicinity of the impact position of the primary electron beam due to so-called proximity effects. Herein, we present a post-treatment procedure to deplete the unintended deposits by moderate sputtering after the deposition process. Moreover, we were able to observe the formation of pure titanium oxide nanocrystals (<100 nm) in situ upon heating the sample in a well-defined oxygen atmosphere. While the nanocrystal growth for the as-deposited structures also occurs in the surroundings of the irradiated area due to proximity effects, it is limited to the pre-defined regions, if the sample was sputtered before heating the sample under oxygen atmosphere. The described two-step post-treatment procedure after EBID presents a new pathway for the fabrication of clean localized nanostructures. PMID:21242619

  9. Electron-beam-induced deposition and post-treatment processes to locally generate clean titanium oxide nanostructures on Si(100)

    NASA Astrophysics Data System (ADS)

    Schirmer, M.; Walz, M.-M.; Vollnhals, F.; Lukasczyk, T.; Sandmann, A.; Chen, C.; Steinrück, H.-P.; Marbach, H.

    2011-02-01

    We have investigated the lithographic generation of TiOx nanostructures on Si(100) via electron-beam-induced deposition (EBID) of titanium tetraisopropoxide (TTIP) in ultra-high vacuum (UHV) by scanning electron microscopy (SEM) and local Auger electron spectroscopy (AES). In addition, the fabricated nanostructures were also characterized ex situ via atomic force microscopy (AFM) under ambient conditions. In EBID, a highly focused electron beam is used to locally decompose precursor molecules and thereby to generate a deposit. A drawback of this nanofabrication technique is the unintended deposition of material in the vicinity of the impact position of the primary electron beam due to so-called proximity effects. Herein, we present a post-treatment procedure to deplete the unintended deposits by moderate sputtering after the deposition process. Moreover, we were able to observe the formation of pure titanium oxide nanocrystals (<100 nm) in situ upon heating the sample in a well-defined oxygen atmosphere. While the nanocrystal growth for the as-deposited structures also occurs in the surroundings of the irradiated area due to proximity effects, it is limited to the pre-defined regions, if the sample was sputtered before heating the sample under oxygen atmosphere. The described two-step post-treatment procedure after EBID presents a new pathway for the fabrication of clean localized nanostructures.

  10. High-purity 3D nano-objects grown by focused-electron-beam induced deposition.

    PubMed

    Córdoba, Rosa; Sharma, Nidhi; Kölling, Sebastian; Koenraad, Paul M; Koopmans, Bert

    2016-09-01

    To increase the efficiency of current electronics, a specific challenge for the next generation of memory, sensing and logic devices is to find suitable strategies to move from two- to three-dimensional (3D) architectures. However, the creation of real 3D nano-objects is not trivial. Emerging non-conventional nanofabrication tools are required for this purpose. One attractive method is focused-electron-beam induced deposition (FEBID), a direct-write process of 3D nano-objects. Here, we grow 3D iron and cobalt nanopillars by FEBID using diiron nonacarbonyl Fe2(CO)9, and dicobalt octacarbonyl Co2(CO)8, respectively, as starting materials. In addition, we systematically study the composition of these nanopillars at the sub-nanometer scale by atom probe tomography, explicitly mapping the homogeneity of the radial and longitudinal composition distributions. We show a way of fabricating high-purity 3D vertical nanostructures of ∼50 nm in diameter and a few micrometers in length. Our results suggest that the purity of such 3D nanoelements (above 90 at% Fe and above 95 at% Co) is directly linked to their growth regime, in which the selected deposition conditions are crucial for the final quality of the nanostructure. Moreover, we demonstrate that FEBID and the proposed characterization technique not only allow for growth and chemical analysis of single-element structures, but also offers a new way to directly study 3D core-shell architectures. This straightforward concept could establish a promising route to the design of 3D elements for future nano-electronic devices. PMID:27454835

  11. High-purity 3D nano-objects grown by focused-electron-beam induced deposition

    NASA Astrophysics Data System (ADS)

    Córdoba, Rosa; Sharma, Nidhi; Kölling, Sebastian; Koenraad, Paul M.; Koopmans, Bert

    2016-09-01

    To increase the efficiency of current electronics, a specific challenge for the next generation of memory, sensing and logic devices is to find suitable strategies to move from two- to three-dimensional (3D) architectures. However, the creation of real 3D nano-objects is not trivial. Emerging non-conventional nanofabrication tools are required for this purpose. One attractive method is focused-electron-beam induced deposition (FEBID), a direct-write process of 3D nano-objects. Here, we grow 3D iron and cobalt nanopillars by FEBID using diiron nonacarbonyl Fe2(CO)9, and dicobalt octacarbonyl Co2(CO)8, respectively, as starting materials. In addition, we systematically study the composition of these nanopillars at the sub-nanometer scale by atom probe tomography, explicitly mapping the homogeneity of the radial and longitudinal composition distributions. We show a way of fabricating high-purity 3D vertical nanostructures of ∼50 nm in diameter and a few micrometers in length. Our results suggest that the purity of such 3D nanoelements (above 90 at% Fe and above 95 at% Co) is directly linked to their growth regime, in which the selected deposition conditions are crucial for the final quality of the nanostructure. Moreover, we demonstrate that FEBID and the proposed characterization technique not only allow for growth and chemical analysis of single-element structures, but also offers a new way to directly study 3D core–shell architectures. This straightforward concept could establish a promising route to the design of 3D elements for future nano-electronic devices.

  12. Fabrication of electron beam deposited tip for atomic-scale atomic force microscopy in liquid.

    PubMed

    Miyazawa, K; Izumi, H; Watanabe-Nakayama, T; Asakawa, H; Fukuma, T

    2015-03-13

    Recently, possibilities of improving operation speed and force sensitivity in atomic-scale atomic force microscopy (AFM) in liquid using a small cantilever with an electron beam deposited (EBD) tip have been intensively explored. However, the structure and properties of an EBD tip suitable for such an application have not been well-understood and hence its fabrication process has not been established. In this study, we perform atomic-scale AFM measurements with a small cantilever and clarify two major problems: contaminations from a cantilever and tip surface, and insufficient mechanical strength of an EBD tip having a high aspect ratio. To solve these problems, here we propose a fabrication process of an EBD tip, where we attach a 2 μm silica bead at the cantilever end and fabricate a 500-700 nm EBD tip on the bead. The bead height ensures sufficient cantilever-sample distance and enables to suppress long-range interaction between them even with a short EBD tip having high mechanical strength. After the tip fabrication, we coat the whole cantilever and tip surface with Si (30 nm) to prevent the generation of contamination. We perform atomic-scale AFM imaging and hydration force measurements at a mica-water interface using the fabricated tip and demonstrate its applicability to such an atomic-scale application. With a repeated use of the proposed process, we can reuse a small cantilever for atomic-scale measurements for several times. Therefore, the proposed method solves the two major problems and enables the practical use of a small cantilever in atomic-scale studies on various solid-liquid interfacial phenomena. PMID:25697199

  13. Chemical composition, morphology and optical properties of zinc sulfide coatings deposited by low-energy electron beam evaporation

    NASA Astrophysics Data System (ADS)

    Ragachev, A. V.; Yarmolenko, M. A.; Rogachev, A. A.; Gorbachev, D. L.; Zhou, Bing

    2014-06-01

    The research determines the features of formation, morphology, chemical composition and optical properties of the coatings deposited by the method, proposed for the first time, of the exposure of mechanical mixture of zinc and sulfur powders to low-energy electron beam evaporation. The findings show that the deposited coatings are characterized by high chemical and structural homogeneity in thickness. The study considers the influence of substrate temperature and thickness of the deposited layer on the morphology and the width of the formed ZnS thin layers band gap. Also was shown the possibility to form ZnS coatings with this method using the mixture of zinc and copper sulfide powders.

  14. Towards a single step process to create high purity gold structures by electron beam induced deposition at room temperature.

    PubMed

    Mansilla, C; Mehendale, S; Mulders, J J L; Trompenaars, P H F

    2016-10-14

    Highly pure metallic structures can be deposited by electron beam induced deposition and they have many important applications in different fields. The organo-metallic precursor is decomposed and deposited under the electron beam, and typically it is purified with post-irradiation in presence of O2. However, this approach limits the purification to the surface of the deposit. Therefore, 'in situ' purification during deposition using simultaneous flows of both O2 and precursor in parallel with two gas injector needles has been tested and verified. To simplify the practical arrangements, a special concentric nozzle has been designed allowing deposition and purification performed together in a single step. With this new device metallic structures with high purity can be obtained more easily, while there is no limit on the height of the structures within a practical time frame. In this work, we summarize the first results obtained for 'in situ' Au purification using this concentric nozzle, which is described in more detail, including flow simulations. The operational parameter space is explored in order to optimize the shape as well as the purity of the deposits, which are evaluated through scanning electron microscope and energy dispersive x-ray spectroscopy measurements, respectively. The observed variations are interpreted in relation to other variables, such as the deposition yield. The resistivity of purified lines is also measured, and the influence of additional post treatments as a last purification step is studied. PMID:27587078

  15. Effects of oxygen on electron beam induced deposition of SiO{sub 2} using physisorbed and chemisorbed tetraethoxysilane

    SciTech Connect

    Bishop, James; Toth, Milos; Phillips, Matthew; Lobo, Charlene

    2012-11-19

    Electron beam induced deposition (EBID) is limited by low throughput and purity of as-grown material. Co-injection of O{sub 2} with the growth precursor is known to increase both the purity and deposition rate of materials such as SiO{sub 2} at room temperature. Here, we show that O{sub 2} inhibits rather than enhances EBID from tetraethoxysilane (TEOS) precursor at elevated temperatures. This behavior is attributed to surface site competition between chemisorbates at elevated temperature, and TEOS decomposition by atomic oxygen produced through electron dissociation of physisorbed O{sub 2} at room temperature.

  16. Comparison of optical resistance of ion assisted deposition and standard electron beam deposition methods for high reflectance dielectric coatings

    NASA Astrophysics Data System (ADS)

    Melninkaitis, A.; Maciulevicius, M.; Rakickas, T.; Miksys, D.; Grigonis, R.; Sirutkaitis, V.; Skrebutenas, A.; Buzelis, R.; Drazdys, R.; Abromavicius, G.

    2005-09-01

    The ion assisted thin film deposition (IAD) method has been used extensively for more than two decades, but questions about possibility of improving of the laser-induced damage threshold (LIDT) by this method compared with the conventional electron-beam evaporation (non-IAD) method are still not fully answered. A more complete understanding of different factors that can influence laser-induced damage threshold is necessary for continued development of multilayer dielectric coatings optimized for high-power laser applications. To clarify these factors we performed comparison of LIDT for IAD and non-IAD coatings in nanosecond and femtosecond pulse ranges. High reflectance mirrors at 800 nm and 532 nm were tested. Mirror coatings were made of ZrO2 and SiO2. Automated LIDT measurements were performed according to the requirements of current ISO 11254-2 standard. Two lasers were used for the measurements: Nd:YAG (λ = 532 nm, τ = 5 ns) and Ti:Sapphire (λ = 800 nm, τ = 130 fs). Measurements at 800 nm and 532 nm were performed at 1-kHz and 10 Hz pulse repetition rate respectively (S-on-1 test). The damage morphology of coatings was characterized by Nomarski microscopy and relation of LIDT with coating parameters was analyzed.

  17. Dynamic modulation of electronic properties of graphene by localized carbon doping using focused electron beam induced deposition.

    PubMed

    Kim, S; Russell, M; Henry, M; Kim, S S; Naik, R R; Voevodin, A A; Jang, S S; Tsukruk, V V; Fedorov, A G

    2015-09-28

    We report on the first demonstration of controllable carbon doping of graphene to engineer local electronic properties of a graphene conduction channel using focused electron beam induced deposition (FEBID). Electrical measurements indicate that an "n-p-n" junction on graphene conduction channel is formed by partial carbon deposition near the source and drain metal contacts by low energy (<50 eV) secondary electrons due to inelastic collisions of long range backscattered primary electrons generated from a low dose of high energy (25 keV) electron beam (1 × 10(18) e(-) per cm(2)). Detailed AFM imaging provides direct evidence of the new mechanism responsible for dynamic evolution of the locally varying graphene doping. The FEBID carbon atoms, which are physisorbed and weakly bound to graphene, diffuse towards the middle of graphene conduction channel due to their surface chemical potential gradient, resulting in negative shift of Dirac voltage. Increasing a primary electron dose to 1 × 10(19) e(-) per cm(2) results in a significant increase of carbon deposition, such that it covers the entire graphene conduction channel at high surface density, leading to n-doping of graphene channel. Collectively, these findings establish a unique capability of FEBID technique to dynamically modulate the doping state of graphene, thus enabling a new route to resist-free, "direct-write" functional patterning of graphene-based electronic devices with potential for on-demand re-configurability. PMID:26302897

  18. Method of fabricating conducting oxide-silicon solar cells utilizing electron beam sublimation and deposition of the oxide

    DOEpatents

    Feng, Tom; Ghosh, Amal K.

    1979-01-01

    In preparing tin oxide and indium tin oxide-silicon heterojunction solar cells by electron beam sublimation of the oxide and subsequent deposition thereof on the silicon, the engineering efficiency of the resultant cell is enhanced by depositing the oxide at a predetermined favorable angle of incidence. Typically the angle of incidence is between 40.degree. and 70.degree. and preferably between 55.degree. and 65.degree. when the oxide is tin oxide and between 40.degree. and 70.degree. when the oxide deposited is indium tin oxide. gi The Government of the United States of America has rights in this invention pursuant to Department of Energy Contract No. EY-76-C-03-1283.

  19. The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

    PubMed Central

    Thorman, Rachel M; Kumar T. P., Ragesh; Fairbrother, D Howard

    2015-01-01

    Summary Focused electron beam induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition outside the area of the primary electron beam and in metal purity due to incomplete precursor decomposition. Both limitations are likely in part caused by reactions of precursor molecules with low-energy (<100 eV) secondary electrons generated by interactions of the primary beam with the substrate. These low-energy electrons are abundant both inside and outside the area of the primary electron beam and are associated with reactions causing incomplete ligand dissociation from FEBID precursors. As it is not possible to directly study the effects of secondary electrons in situ in FEBID, other means must be used to elucidate their role. In this context, gas phase studies can obtain well-resolved information on low-energy electron-induced reactions with FEBID precursors by studying isolated molecules interacting with single electrons of well-defined energy. In contrast, ultra-high vacuum surface studies on adsorbed precursor molecules can provide information on surface speciation and identify species desorbing from a substrate during electron irradiation under conditions more representative of FEBID. Comparing gas phase and surface science studies allows for insight into the primary deposition mechanisms for individual precursors; ideally, this information can be used to design future FEBID precursors and optimize deposition conditions. In this review, we give a summary of different low-energy electron-induced fragmentation processes that can be initiated by the secondary electrons generated in FEBID, specifically, dissociative electron attachment, dissociative ionization, neutral dissociation, and dipolar dissociation, emphasizing the

  20. In situ mass measurement of electron-beam-induced nanometer-sized W-related deposits using a carbon nanotube cantilever

    SciTech Connect

    Sawaya, Shintaro; Akita, Seiji; Nakayama, Yoshikazu

    2006-11-06

    Using a carbon nanotube oscillator, the authors performed in situ measurements of densities of electron-beam-induced tungsten compounds with size of less than 100 nm. Total mass of the deposit was proportional to the deposition time. A higher deposition rate was obtained at lower electron-beam acceleration voltage. Density of the deposit decreased from 2.7 to 1.4 g/cm{sup 3} with increasing acceleration voltage from 5 to 15 kV. These results indicate that the increased density with low-acceleration voltage produces effective decomposition of W(CO){sub 6}.

  1. Purification of Nanoscale Electron-Beam-Induced Platinum Deposits via a Pulsed Laser-Induced Oxidation Reaction

    DOE PAGESBeta

    Stanford, Michael G.; Lewis, Brett B.; Noh, Joo Hyon; Fowlkes, Jason Davidson; Roberts, Nicholas A.; Plank, Harald; Rack, Philip D.

    2014-11-05

    Platinum–carbon deposits made via electron-beam-induced deposition were purified in this study via a pulsed laser-induced oxidation reaction and erosion of the amorphous carbon to form pure platinum. Purification proceeds from the top down and is likely catalytically facilitated via the evolving platinum layer. Thermal simulations suggest a temperature threshold of ~485 K, and the purification rate is a function of the PtC5 thickness (80–360 nm) and laser pulse width (1–100 μs) in the ranges studied. The thickness dependence is attributed to the ~235 nm penetration depth of the PtC5 composite at the laser wavelength, and the pulse-width dependence is attributedmore » to the increased temperatures achieved at longer pulse widths. Finally, remarkably fast purification is realized at cumulative laser exposure times of less than 1 s.« less

  2. Purification of Nanoscale Electron-Beam-Induced Platinum Deposits via a Pulsed Laser-Induced Oxidation Reaction

    SciTech Connect

    Stanford, Michael G.; Lewis, Brett B.; Noh, Joo Hyon; Fowlkes, Jason Davidson; Roberts, Nicholas A.; Plank, Harald; Rack, Philip D.

    2014-11-05

    Platinum–carbon deposits made via electron-beam-induced deposition were purified in this study via a pulsed laser-induced oxidation reaction and erosion of the amorphous carbon to form pure platinum. Purification proceeds from the top down and is likely catalytically facilitated via the evolving platinum layer. Thermal simulations suggest a temperature threshold of ~485 K, and the purification rate is a function of the PtC5 thickness (80–360 nm) and laser pulse width (1–100 μs) in the ranges studied. The thickness dependence is attributed to the ~235 nm penetration depth of the PtC5 composite at the laser wavelength, and the pulse-width dependence is attributed to the increased temperatures achieved at longer pulse widths. Finally, remarkably fast purification is realized at cumulative laser exposure times of less than 1 s.

  3. Mixed films of TiO2-SiO2 deposited by double electron-beam coevaporation

    NASA Astrophysics Data System (ADS)

    Chen, Jyh-Shin; Chao, Shiuh; Kao, Jiann-Shiun; Niu, Huan; Chen, Chih-Hsin

    1996-01-01

    We used double electron-beam coevaporation to fabricate TiO2-SiO2 mixed films. The deposition process included oxygen partial pressure, substrate temperature, and deposition rate, all of which were real-time computer controlled. The optical properties of the mixed films varied from pure SiO2 to pure TiO2 as the composition of the films varied accordingly. X-ray diffraction showed that the mixed films all have amorphous structure with a SiO2 content of as low as 11%. Atomic force microscopy showed that the mixed film has a smoother surface than pure TiO2 film because of its amorphous structure. Linear and Bruggeman's effective medium approximation models fit the experimental data better than other models.

  4. Interfacial mixing and internal structure of Pt-containing nanocomposites grown by room temperature electron beam induced deposition

    SciTech Connect

    Li Juntao; Dunn, Kathleen A.; Thiel, Bradley L.; Toth, Milos

    2010-05-15

    Material grown by room temperature electron beam induced deposition (EBID) using (CH{sub 3}){sub 3}CH{sub 3}C{sub 5}H{sub 4}Pt precursor consists of platinum nanocrystals embedded in an amorphous matrix. The crystallites are shown to intermix with the amorphous oxide on a Si substrate. The extent of intermixing scales with the electron energy density delivered to the material during growth. Dependencies on electron flux, fluence, and exposure time indicate that the intermixing process is athermal, electron-activated, and rate limited by mass transport inside the solid. Furthermore, the degree of deposit crystallinity is shown to scale with the electron flux and fluence used for EBID. We discuss mechanisms behind the observed changes in nanostructure and implications for the growth of functional materials by EBID.

  5. Reversible wettability of electron-beam deposited indium-tin-oxide driven by ns-UV irradiation

    SciTech Connect

    Persano, Luana; Del Carro, Pompilio; Pisignano, Dario

    2012-04-09

    Indium tin oxide (ITO) is one of the most widely used semiconductor oxides in the field of organic optoelectronics, especially for the realization of anode contacts. Here the authors report on the control of the wettability properties of ITO films deposited by reactive electron beam deposition and irradiated by means of nanosecond-pulsed UV irradiation. The enhancement of the surface water wettability, with a reduction of the water contact angle larger than 50 deg., is achieved by few tens of seconds of irradiation. The analyzed photo-induced wettability change is fully reversible in agreement with a surface-defect model, and it can be exploited to realize optically transparent, conductive surfaces with controllable wetting properties for sensors and microfluidic circuits.

  6. On the magnetic properties of iron nanostructures fabricated via focused electron beam induced deposition and autocatalytic growth processes.

    PubMed

    Tu, F; Drost, M; Vollnhals, F; Späth, A; Carrasco, E; Fink, R H; Marbach, H

    2016-09-01

    We employ Electron beam induced deposition (EBID) in combination with autocatalytic growth (AG) processes to fabricate magnetic nanostructures with controllable shapes and thicknesses. Following this route, different Fe deposits were prepared on silicon nitride membranes under ultra-high vacuum conditions and studied by scanning electron microscopy (SEM) and scanning transmission x-ray microspectroscopy (STXM). The originally deposited Fe nanostructures are composed of pure iron, especially when fabricated via autocatalytic growth processes. Quantitative near-edge x-ray absorption fine structure (NEXAFS) spectroscopy was employed to derive information on the thickness dependent composition. X-ray magnetic circular dichroism (XMCD) in STXM was used to derive the magnetic properties of the EBID prepared structures. STXM and XMCD analysis evinces the existence of a thin iron oxide layer at the deposit-vacuum interface, which is formed during exposure to ambient conditions. We were able to extract magnetic hysteresis loops for individual deposits from XMCD micrographs with varying external magnetic field. Within the investigated thickness range (2-16 nm), the magnetic coercivity, as evaluated from the width of the hysteresis loops, increases with deposit thickness and reaches a maximum value of ∼160 Oe at around 10 nm. In summary, we present a viable technique to fabricate ferromagnetic nanostructures in a controllable way and gain detailed insight into their chemical and magnetic properties. PMID:27454990

  7. Electron beam-physical vapor deposition of SiC/SiO 2 high emissivity thin film

    NASA Astrophysics Data System (ADS)

    Yi, Jian; He, XiaoDong; Sun, Yue; Li, Yao

    2007-02-01

    When heated by high-energy electron beam (EB), SiC can decompose into C and Si vapor. Subsequently, Si vapor reacts with metal oxide thin film on substrate surface and formats dense SiO 2 thin film at high substrate temperature. By means of the two reactions, SiC/SiO 2 composite thin film was prepared on the pre-oxidized 316 stainless steel (SS) substrate by electron beam-physical vapor deposition (EB-PVD) only using β-SiC target at 1000 °C. The thin film was examined by energy dispersive spectroscopy (EDS), grazing incidence X-ray asymmetry diffraction (GIAXD), scanning electron microscopy (SEM), atomic force microscopy (AFM), backscattered electron image (BSE), electron probe microanalysis (EPMA), X-ray photoelectron spectroscopy (XPS) and Fourier transformed infra-red (FT-IR) spectroscopy. The analysis results show that the thin film is mainly composed of imperfect nano-crystalline phases of 3C-SiC and SiO 2, especially, SiO 2 phase is nearly amorphous. Moreover, the smooth and dense thin film surface consists of nano-sized particles, and the interface between SiC/SiO 2 composite thin film and SS substrate is perfect. At last, the emissivity of SS substrate is improved by the SiC/SiO 2 composite thin film.

  8. Dynamic modulation of electronic properties of graphene by localized carbon doping using focused electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    Kim, S.; Russell, M.; Henry, M.; Kim, S. S.; Naik, R. R.; Voevodin, A. A.; Jang, S. S.; Tsukruk, V. V.; Fedorov, A. G.

    2015-09-01

    We report on the first demonstration of controllable carbon doping of graphene to engineer local electronic properties of a graphene conduction channel using focused electron beam induced deposition (FEBID). Electrical measurements indicate that an ``n-p-n'' junction on graphene conduction channel is formed by partial carbon deposition near the source and drain metal contacts by low energy (<50 eV) secondary electrons due to inelastic collisions of long range backscattered primary electrons generated from a low dose of high energy (25 keV) electron beam (1 × 1018 e- per cm2). Detailed AFM imaging provides direct evidence of the new mechanism responsible for dynamic evolution of the locally varying graphene doping. The FEBID carbon atoms, which are physisorbed and weakly bound to graphene, diffuse towards the middle of graphene conduction channel due to their surface chemical potential gradient, resulting in negative shift of Dirac voltage. Increasing a primary electron dose to 1 × 1019 e- per cm2 results in a significant increase of carbon deposition, such that it covers the entire graphene conduction channel at high surface density, leading to n-doping of graphene channel. Collectively, these findings establish a unique capability of FEBID technique to dynamically modulate the doping state of graphene, thus enabling a new route to resist-free, ``direct-write'' functional patterning of graphene-based electronic devices with potential for on-demand re-configurability.We report on the first demonstration of controllable carbon doping of graphene to engineer local electronic properties of a graphene conduction channel using focused electron beam induced deposition (FEBID). Electrical measurements indicate that an ``n-p-n'' junction on graphene conduction channel is formed by partial carbon deposition near the source and drain metal contacts by low energy (<50 eV) secondary electrons due to inelastic collisions of long range backscattered primary electrons generated

  9. On the magnetic properties of iron nanostructures fabricated via focused electron beam induced deposition and autocatalytic growth processes

    NASA Astrophysics Data System (ADS)

    Tu, F.; Drost, M.; Vollnhals, F.; Späth, A.; Carrasco, E.; Fink, R. H.; Marbach, H.

    2016-09-01

    We employ Electron beam induced deposition (EBID) in combination with autocatalytic growth (AG) processes to fabricate magnetic nanostructures with controllable shapes and thicknesses. Following this route, different Fe deposits were prepared on silicon nitride membranes under ultra-high vacuum conditions and studied by scanning electron microscopy (SEM) and scanning transmission x-ray microspectroscopy (STXM). The originally deposited Fe nanostructures are composed of pure iron, especially when fabricated via autocatalytic growth processes. Quantitative near-edge x-ray absorption fine structure (NEXAFS) spectroscopy was employed to derive information on the thickness dependent composition. X-ray magnetic circular dichroism (XMCD) in STXM was used to derive the magnetic properties of the EBID prepared structures. STXM and XMCD analysis evinces the existence of a thin iron oxide layer at the deposit–vacuum interface, which is formed during exposure to ambient conditions. We were able to extract magnetic hysteresis loops for individual deposits from XMCD micrographs with varying external magnetic field. Within the investigated thickness range (2–16 nm), the magnetic coercivity, as evaluated from the width of the hysteresis loops, increases with deposit thickness and reaches a maximum value of ∼160 Oe at around 10 nm. In summary, we present a viable technique to fabricate ferromagnetic nanostructures in a controllable way and gain detailed insight into their chemical and magnetic properties.

  10. Simulation of Fine Resist Profile Formation by Electron Beam Drawing and Development with Solubility Rate Based on Energy Deposition Distribution

    NASA Astrophysics Data System (ADS)

    Zhang, Hui; Komori, Takuya; Zhang, Yulong; Yin, You; Hosaka, Sumio

    2013-12-01

    We proposed a model for calculating the resist profile in electron beam drawing. The model predicts the solubility rate on the basis of the energy deposition distribution (EDD) for the development of latent patterns in the resist. By unifying the exposure dose D (via experiments) and EDDs (via calculations), we roughly determined solubility rates for three-dimensional EDDs, and established the proposed model. The development simulation was achieved by the sequential calculation method for solubility rates based on EDD which was calculated by Monte Carlo simulation. By determining a suitable EDD region to achieve good patterning, we obtained a sharp nanodot pattern of the resist. This simulation results are in good agreement with the experimental results obtained using a combination of 2.3 wt % tetramethylammonium hydroxide (TMAH) and 4 wt % NaCl as the developer. The model was demonstrated to be useful for predicting resist profiles with different experimental solubility rates of developers.

  11. Fabrication and electrical transport properties of binary Co-Si nanostructures prepared by focused electron beam-induced deposition

    SciTech Connect

    Porrati, F.; Huth, M.; Kaempken, B.; Terfort, A.

    2013-02-07

    CoSi-C binary alloys have been fabricated by focused electron beam-induced deposition by the simultaneous use of dicobaltoctacarbonyl, Co{sub 2}(CO){sub 8}, and neopentasilane, Si{sub 5}H{sub 12}, as precursor gases. By varying the relative flux of the precursors, alloys with variable chemical composition are obtained, as shown by energy dispersive x-ray analysis. Room temperature electrical resistivity measurements strongly indicate the formation of cobalt silicide and cobalt disilicide nanoclusters embedded in a carbonaceous matrix. Temperature-dependent electrical conductivity measurements show that the transport properties are governed by electron tunneling between neighboring CoSi or CoSi{sub 2} nanoclusters. In particular, by varying the metal content of the alloy, the electrical conductivity can be finely tuned from the insulating regime into the quasi-metallic tunneling coupling regime.

  12. Giant anomalous Hall effect in Fe-based microwires grown by focused-electron-beam-induced deposition

    NASA Astrophysics Data System (ADS)

    Córdoba, R.; Lavrijsen, R.; Fernández-Pacheco, A.; Ibarra, M. R.; Schoenaker, F.; Ellis, T.; Barcones-Campo, B.; Kohlhepp, J. T.; Swagten, H. J. M.; Koopmans, B.; Mulders, J. J. L.; De Teresa, J. M.

    2012-01-01

    We report the temperature dependence of the resistivity, the anisotropic magnetoresistance and the Hall effect of iron microwires grown by focused-electron-beam-induced deposition. By modifying the growth conditions in a controllable way, we study wires with iron compositions varying from 45% to 70%, which present different electrical conduction mechanisms, with resistivity values differing over three orders of magnitude. The magnetoresistance depends highly on the composition, and it can be understood by a subtle interplay between the anisotropic magnetoresistance and intergrain magnetoresistance due to their complex microstructure, consisting of an iron-carbon-oxygen amorphous matrix. A giant value for the anomalous Hall effect is found, which we explain by a large contribution of the skew scattering mechanism. The present results emphasize the correlation between the exotic microstructure of the microwires, and their magnetotransport properties.

  13. Properties of optical thin films and coatings prepared by reactive electron-beam deposition with and without ion bombardments

    NASA Astrophysics Data System (ADS)

    Tsai, Rung Y.; Shiau, Sen C.; Lee, Chii H.; Ho, Fang C.; Hua, Mu-Yi

    1997-12-01

    The structural, microstructural, optical, and mechanical properties of MgF2, SiO2, and TiO2 films prepared by reactive electron-beam deposition (EBD) and reactive ion- assisted deposition (IAD) were systematically investigated using an x-ray diffractometer (XRD), a transmission electron microscope, a spectrophotometer, and a microhardness tester, respectively. A mixture gas of pure argon and pure oxygen was used as the reactant. The mean ion energy was about 90 eV for the IAD process. Results show that the preferred orientation, refractive index, and hardness of the films were strongly influenced by ion bombardments, although the variations of the phases and grain sizes were insignificant. With the fixed x- ray incident angle of 2 deg, the measured preferred orientation of polycrystalline MgF2 films deposited on unheated glass substrate by IAD was [110], which was consistent with the powder XRD pattern of MgF2, whereas that of the film deposited by EBD at a substrate temperature of 280 degrees Celsius was [111]. The refractive index and hardness of the films deposited by IAD were always higher than those of the respective films deposited by EBD at a substrate temperature of 280 degrees Celsius, which were due to the higher packing density caused by energetic ion bombardments. A 24-layer near-IR cutoff filter of alternating SiO2 and TiO2 layers prepared by IAD was more efficient on near-IR isolation and more thermally stable than that prepared by EBD. The optical thickness variation for the filter prepared by IAD over a substrate holder radius of 30 cm was less than 1%.

  14. Fundamental electron-precursor-solid interactions derived from time dependent electron beam induced deposition simulations and experiments

    SciTech Connect

    Fowlkes, Jason Davidson; Rack, Philip D

    2010-01-01

    Unknown parameters critical to understanding the electron-precursor substrate interactions during electron beam induced deposition (EBID) have long limited our ability to fully control this nanoscale, directed assembly method. We report here values for the fundamental interaction parameters of D, the precursor surface diffusion coefficient, delta, the sticking probability and tau, the mean surface residence time which are critical parameters for understanding the assembly of EBID deposits. Values of D=6.4um2s-1, delta=0.0250 and tau=3.2ms were determined for a commonly used precursor molecule tungsten hexacarbonyl W(CO)6. Space and time predictions of the adsorbed precursor coverage C(r,t) were solved by an explicit finite differencing numerical scheme. Evolving nanopillar surface morphology was derived from solutions of C(r,t) considering electron induced dissociation as the critical depletion term. This made it possible to infer the space and time dependent precursor coverage both on, and around nanopillar structures to better understand local precursor dynamics during mass transport limited (MTL) and reaction rate limited (RRL) EBID.

  15. Direct writing of CoFe alloy nanostructures by focused electron beam induced deposition from a heteronuclear precursor

    NASA Astrophysics Data System (ADS)

    Porrati, F.; Pohlit, M.; Müller, J.; Barth, S.; Biegger, F.; Gspan, C.; Plank, H.; Huth, M.

    2015-11-01

    Recently, focused electron beam-induced deposition has been employed to prepare functional magnetic nanostructures with potential in nanomagnetic logic and sensing applications by using homonuclear precursor gases like Fe(CO)5 or Co2(CO)8. Here we show that an extension towards the fabrication of bi-metallic compounds is possible by using a single-source heteronuclear precursor gas. We have grown CoFe alloy magnetic nanostructures from the HFeCo3(CO)12 metal carbonyl precursor. The compositional analysis indicates that the samples contain about 80 at% of metal and 10 at% of carbon and oxygen. Four-probe magnetotransport measurements are carried out on nanowires of various sizes down to a width of 50 nm, for which a room temperature resistivity of 43 μΩcm is found. Micro-Hall magnetometry reveals that 50 nm × 250 nm nanobars of the material are ferromagnetic up to the highest measured temperature of 250 K. Finally, the transmission electron microscopy (TEM) microstructural investigation shows that the deposits consist of a bcc Co-Fe phase mixed with a FeCo2 O4 spinel oxide phase with nanograins of about 5 nm diameter.

  16. Electron-beam-deposited thin polymer films - Electrical properties vs bombarding current.

    NASA Technical Reports Server (NTRS)

    Babcock, L. E.; Christy, R. W.

    1972-01-01

    Polymer films about 150 A thick, deposited on glass substrates by electron bombardment of tetramethyltetraphenyltrisiloxane, were studied, after being sandwiched between evaporated aluminum electrodes, the top one semitransparent. The capacitance, conductance, and photoconductance of the sandwiches were measured at room temperature as a function of the electron bombarding current which formed the polymer. The polymer thickness was obtained independently from Christy's (1960) empirical formula for the rate of formation. The obtained results indicate that, with increasing bombarding current, the polymer undergoes an increase in both crosslinking bonds and dangling bonds. Exposure to air drastically reduces the density of dangling bonds, but does not affect the crosslinking.

  17. Impact of deposition parameters on the performance of ceria based resistive switching memories

    NASA Astrophysics Data System (ADS)

    Zhang, Lepeng; Younis, Adnan; Chu, Dewei; Li, Sean

    2016-07-01

    Resistive-switching memories stacked in a metal–insulator–metal (MIM) like structure have shown great potential for next generation non-volatile memories. In this study, ceria based resistive memory stacks are fabricated by implementing different sputter conditions (temperatures and powers). The films deposited at low temperatures were found to have random grain orientations, less porosity and dense structure. The effect of deposition conditions on resistive switching characteristics of as-prepared films were also investigated. Improved and reliable resistive switching behaviors were achieved for the memory devices occupying less porosity and densely packed structures prepared at low temperatures. Finally, the underlying switching mechanism was also explained on the basis of quantitative analysis.

  18. Optical and structural characterization of thermal oxidation effects of erbium thin films deposited by electron beam on silicon

    SciTech Connect

    Kamineni, Himani S.; Kamineni, Vimal K.; Moore, Richard L.; Gallis, Spyros; Diebold, Alain C.; Huang Mengbing; Kaloyeros, Alain E.

    2012-01-01

    Thermal oxidation effects on the structural, compositional, and optical properties of erbium films deposited on silicon via electron beam evaporation were analyzed by x-ray diffraction, x-ray photoelectron spectroscopy, Auger electron spectroscopy, and spectroscopic ellipsometry. A gradual rise in oxidation temperature from 700 to 900 deg. C resulted in a transition from ErO- to Er{sub 2}O{sub 3}-rich phase. Additional increase in oxidation temperature above 1000 deg. C led to the formation of erbium silicate due to further oxygen incorporation, as well as silicon out-diffusion from the substrate. A silicon oxide interfacial layer was also detected, with its thickness increasing with higher oxidation temperature. Additionally, film refractive index decreased, while its Tauc bandgap value increased from {approx}5.2 eV to {approx}6.4 eV, as the oxidation temperature was raised from 700 deg. C to above 900 deg. C. These transformations were accompanied by the appearance of an intense and broad absorption band below the optical gap. Thermal oxidation effects are discussed in the context of film structural characteristics and defect states.

  19. Structural and Optical Properties of Cd 1- x Se x Thin Films Deposited by Electron Beam Evaporation Technique

    NASA Astrophysics Data System (ADS)

    Tripathi, Ravishankar Nath; Verma, Aneet Kumar; Rahul, Vishwakarma, S. R.

    2011-10-01

    Cadmium selenide (CdSe) thin films deposited by means of electron beam evaporation technique under high vacuum ˜10 -5 torr on ultrasonically cleaned glass substrate. Using stating materials of various compositions of cadmium and selenium using formula Cd 1- x Se x where x is orbitory constant having value 0.20≤ x ≤0.40 here we take less value of x for the creation of anion vacancy in thin films. In present work the structural properties have been studies using XRD technique and found that starting materials and thin films both are polycrystalline in nature having hexagonal structure. Here we study the effect of composition ratio Cd/Se in starting material and its prepared thin films on its grain size and lattice parameter. From the analysis of X-Ray diffractogram found that lattice parameter and grain size both are decreases with increasing Cd/Se ratio in thin films as well as in starting material the preferred orientation in thin films along (100) plane. The surface morphology was studied using SEM characterization and found that films are smooth and homogeneous. The films have been analysed for optical band gap and absorbed a direct band gap.

  20. Resonant light scattering from a single dielectric nano-antenna formed by electron beam-induced deposition

    PubMed Central

    Lee, Eun-Khwang; Song, Jung-Hwan; Jeong, Kwang-Yong; Kang, Ju-Hyung; Park, Hong-Gyu; Seo, Min-Kyo

    2015-01-01

    Dielectric nano-antennas are promising elements in nanophotonics due to their low material loss and strong leaky-mode optical resonances. In particular, light scattering can be easily manipulated using dielectric nano-antennas. To take full advantage of dielectric nano-antennas and explore their new optical applications, it is necessary to fabricate three-dimensional nano-structures under arbitrary conditions such as in non-planar substrates. Here, we demonstrate full-visible-range resonant light scattering from a single dielectric optical nano-rod antenna. The nano-rod antenna was formed by electron beam-induced deposition (EBID), a promising three-dimensional nanofabrication technique with a high spatial resolution. The nano-rods consist of amorphous alloys of C and O, with a width of 180 nm on average and a length of 4.5 μm. Polarization-resolved dark-field scattering measurements show that both transverse-electric and transverse-magnetic mode resonances cover the full visible range as the height of the nano-rod antenna varies from 90 to 280 nm. Numerical simulations successfully reproduce the measured scattering features and characterize the modal properties, using the critical points dispersive dielectric constant of the EBID carbonaceous material. Our deep understanding of resonant light scattering in the EBID dielectric nano-antenna will be useful for near-field measurement or for the implementation of three-dimensional nanophotonic devices. PMID:25988729

  1. Fabrication of FeSi and Fe3Si compounds by electron beam induced mixing of [Fe/Si]2 and [Fe3/Si]2 multilayers grown by focused electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    Porrati, F.; Sachser, R.; Gazzadi, G. C.; Frabboni, S.; Huth, M.

    2016-06-01

    Fe-Si binary compounds have been fabricated by focused electron beam induced deposition by the alternating use of iron pentacarbonyl, Fe(CO)5, and neopentasilane, Si5H12 as precursor gases. The fabrication procedure consisted in preparing multilayer structures which were treated by low-energy electron irradiation and annealing to induce atomic species intermixing. In this way, we are able to fabricate FeSi and Fe3Si binary compounds from [Fe/Si]2 and [Fe3/Si]2 multilayers, as shown by transmission electron microscopy investigations. This fabrication procedure is useful to obtain nanostructured binary alloys from precursors which compete for adsorption sites during growth and, therefore, cannot be used simultaneously.

  2. Understanding the electron-stimulated surface reactions of organometallic complexes to enable design of precursors for electron beam-induced deposition

    NASA Astrophysics Data System (ADS)

    Spencer, Julie A.; Rosenberg, Samantha G.; Barclay, Michael; Wu, Yung-Chien; McElwee-White, Lisa; Howard Fairbrother, D.

    2014-12-01

    Standard practice in electron beam-induced deposition (EBID) is to use precursors designed for thermal processes, such as chemical vapor deposition (CVD). However, organometallic precursors that yield pure metal deposits in CVD often create EBID deposits with high levels of organic contamination. This contamination negatively impacts the deposit's properties (e.g., by increasing resistivity or decreasing catalytic activity) and severely limits the range of potential applications for metal-containing EBID nanostructures. To provide the information needed for the rational design of precursors specifically for EBID, we have employed an ultra-high vacuum (UHV) surface science approach to identify the elementary reactions of organometallic precursors during EBID. These UHV studies have demonstrated that the initial electron-induced deposition of the surface-bound organometallic precursors proceeds through desorption of one or more of the ligands present in the parent compound. In specific cases, this deposition step has been shown to proceed via dissociative electron attachment, involving low-energy secondary electrons generated by the interaction of the primary beam with the substrate. Electron beam processing of the surface-bound species produced in the initial deposition event usually causes decomposition of the residual ligands, creating nonvolatile fragments. This process is believed to be responsible for a significant fraction of the organic contaminants typically observed in EBID nanostructures. A few ligands (e.g., halogens) can, however, desorb during electron beam processing while other ligands (e.g., PF3, CO) can thermally desorb if elevated substrate temperatures are used during deposition. Using these general guidelines for reactivity, we propose some design strategies for EBID precursors. The ultimate goal is to minimize organic contamination and thus overcome the key bottleneck for fabrication of relatively pure EBID nanostructures.

  3. Energy deposition evaluation for ultra-low energy electron beam irradiation systems using calibrated thin radiochromic film and Monte Carlo simulations.

    PubMed

    Matsui, S; Mori, Y; Nonaka, T; Hattori, T; Kasamatsu, Y; Haraguchi, D; Watanabe, Y; Uchiyama, K; Ishikawa, M

    2016-05-01

    For evaluation of on-site dosimetry and process design in industrial use of ultra-low energy electron beam (ULEB) processes, we evaluate the energy deposition using a thin radiochromic film and a Monte Carlo simulation. The response of film dosimeter was calibrated using a high energy electron beam with an acceleration voltage of 2 MV and alanine dosimeters with uncertainty of 11% at coverage factor 2. Using this response function, the results of absorbed dose measurements for ULEB were evaluated from 10 kGy to 100 kGy as a relative dose. The deviation between the responses of deposit energy on the films and Monte Carlo simulations was within 15%. As far as this limitation, relative dose estimation using thin film dosimeters with response function obtained by high energy electron irradiation and simulation results is effective for ULEB irradiation processes management. PMID:27250416

  4. Superconductivity and metallic behavior in Pb{sub x}C{sub y}O{sub δ} structures prepared by focused electron beam induced deposition

    SciTech Connect

    Winhold, M. Weirich, P. M.; Schwalb, C. H.; Huth, M.

    2014-10-20

    Focused electron beam induced deposition as a direct-write approach possesses great potential to meet the demands for superconducting nanostructure fabrication especially regarding its 3D patterning capabilities combined with the high resolution in the nanometer regime. So far, however, it was not possible to fabricate superconducting structures with this technique. In this work, we present a lead-based superconductor prepared by focused electron beam induced deposition by dissociation of the precursor tetraethyllead. The as-grown structures exhibit metallic behavior and a minimum resistivity in the normal state of ρ = 16 μΩcm at T = 9 K followed by a superconducting transition at T{sub c} = 7.2 K.

  5. Evolution of microstructure during the growth of thermal barrier coatings by electron-beam physical vapor deposition

    NASA Astrophysics Data System (ADS)

    Terry, Scott Gregory

    2001-12-01

    The mechanisms responsible for the formation of porosity and crystallographic orientation (texture) in the microstructure of thermal barrier coatings (TBCs) grown by electron-beam physical vapor deposition (EB-PVD) are investigated. A matrix of 7 wt.% Y2O3-ZrO2 TBC specimens was generated by independently varying two processing parameters: substrate temperature (Ts) and pattern of vapor incidence. TBCs deposited on stationary substrates oriented normal to the vapor source yielded columnar microstructures possessing fiber textures. Growth directions changed from <111> to <111> + <110> to <110> + <113> as Ts increased from 900-1100°C. Increasing the angle of vapor incidence to 45° favored biaxially aligned columnar growth in the <110> direction, while rotating the substrates produced biaxially aligned <100> columns. The texture orientation is correlated with the observed column tip morphologies by considering the growth directions defined by symmetric arrangements of {111} preferred growth planes about a column axis. The change in texture orientation with increasing Ts under normal incidence on stationary substrates is linked to changes in the mechanism of crystal growth. The pattern of vapor incidence on stationary oblique and rotated substrates has a stronger influence on texture than Ts. Here, the requirement that faces composing a column tip receive equal amounts of vapor flux determines the outcome of a competitive growth process yielding the observed biaxial orientations. The formation of porosity is in general attributed to shadowing of the incident vapor by geometric features of the TBC surface. These features are crystallographic in nature such that the formation of porosity is intimately tied to the crystallographic texture of the coating. Intercolumnar gaps are generated by the interaction between the pattern of vapor incidence and the column tip morphology, whereas the feather-like shape of the open intracolumnar porosity evolves from shadows cast by

  6. Magnetron sputtering system for coatings deposition with activation of working gas mixture by low-energy high-current electron beam

    NASA Astrophysics Data System (ADS)

    Gavrilov, N. V.; Kamenetskikh, A. S.; Men'shakov, A. I.; Bureyev, O. A.

    2015-11-01

    For the purposes of efficient decomposition and ionization of the gaseous mixtures in a system for coatings deposition using reactive magnetron sputtering, a low-energy (100-200 eV) high-current electron beam is generated by a grid-stabilized plasma electron source. The electron source utilizes both continuous (up to 20 A) and pulse-periodic mode of discharge with a self-heated hollow cathode (10-100 A; 0.2 ms; 10-1000 Hz). The conditions for initiation and stable burning of the high-current pulse discharge are studied along with the stable generation of a low-energy electron beam within the gas pressure range of 0.01 - 1 Pa. It is shown that the use of the electron beam with controllable parameters results in reduction of the threshold values both for the pressure of gaseous mixture and for the fluxes of molecular gases. Using such a beam also provides a wide range (0.1-10) of the flux density ratios of ions and sputtered atoms over the coating surface, enables an increase in the maximum pulse density of ion current from plasma up to 0.1 A, ensures an excellent adhesion, optimizes the coating structure, and imparts improved properties to the superhard nanocomposite coatings of (Ti,Al)N/a-Si3N4 and TiC/-a-C:H. Mass-spectrometric measurements of the beam-generated plasma composition proved to demonstrate a twofold increase in the average concentration of N+ ions in the Ar-N2 plasma generated by the high-current (100 A) pulsed electron beam, as compared to the dc electron beam.

  7. Morphological, structural and electrochemical analysis of sputter-deposited ceria and titania coatings for MCFC application

    NASA Astrophysics Data System (ADS)

    Albin, Valérie; Mendoza, Leonardo; Goux, Aurélie; Ringuedé, Armelle; Billard, Alain; Briois, Pascal; Cassir, Michel

    In order to protect the MCFC nickel cathode, TiO 2 and CeO 2 coatings were prepared by DC reactive magnetron sputtering. These oxides are stable thermodynamically whatever the cathode or anode gaseous conditions. Good quality, dense and homogeneous coatings were obtained at thicknesses lower than 1 μm. The structure of the deposits, as analysed by XRD, was the expected one. In this work only dense nickel substrates were used. After their direct immersion in a Li 2CO 3-Na 2CO 3 carbonate eutectic at 650 °C, which can be considered as extremely corrosive conditions with respect to the usual MCFC conditions, the coatings were affected. TiO 2 coatings were transformed into Li 2TiO 3, in agreement with thermodynamic predictions; however, they became progressively unstable, which was probably due to a problem of mechanical adhesion rather than to solubility. The thinner was the deposit, the higher was its conductance and the closer to that of a pure Ni electrode was its electrocatalytic activity. CeO 2 coatings were stable in a ceria form and their adhesion was better even though not fully satisfactory. These first preliminary results are promising regarding the direct contact of the coatings with the corrosive carbonate melt, but the improvement of the adhesion is one of the major problems to solve.

  8. Failure mechanisms of platinum aluminide bond coat/electron beam-physical vapor deposited thermal barrier coatings

    NASA Astrophysics Data System (ADS)

    Vaidyanathan, Krishnakumar

    Thermal barrier coatings (TBCs) allow operation of structural components, such as turbine blades and vanes in industrial and aircraft gas engines, at temperatures close to the substrate melting temperatures. They consist of four different layers; a high strength creep-resistant nickel-based superalloy substrate, an oxidation resistant bond coat (BC), a low thermal conductivity ceramic topcoat and a thermally grown oxide (TGO), that is predominantly alpha-Al 2O3, that forms between the BC and the TBC. Compressive stresses (3--5 GPa) that are generated in the thin TGO (0.25--8 mum) due to the mismatch in thermal coefficient of expansion between the TGO and BC play a critical role in the failure of these coatings. In this study, the failure mechanisms of a commercial yttria-stabilized zirconia (7YSZ) electron beam-physical vapor deposited (EB-PVD) coating on platinum aluminide (beta-(Ni,Pt)Al) bond coat have been identified. Two distinct mechanisms have been found responsible for the observed damage initiation and progression at the TGO/bond coat interface. The first mechanism leads to localized debonding at TGO/bond coat interface due to increased out-of-plane tensile stress, along bond coat features that manifest themselves as ridges. The second mechanism causes cavity formation at the TGO/bond coat interface, driven by cyclic plasticity of the bond coat. It has been found that the debonding at the TGO/bond coat interface due to the first mechanism is solely life determining. The final failure occurs by crack extension along either the TGO/bond coat interface or the TGO/YSZ interface or a combination of both, leading to large scale buckling. Based on these mechanisms, it is demonstrated that the bond coat grain size and the aspect ratio of the ridges have a profound influence on spallation lives of the coating. The removal of these ridges by fine polishing prior to TBC deposition led to a four-fold improvement in life. The failure mechanism identified for the

  9. Electron Beam Freeform Fabrication

    NASA Video Gallery

    Electron Beam Freeform Fabrication (EBF3) is a process by which NASA hopes to build metal parts in zero gravity environments. It's a layer-additive process that uses an electron beam and a solid wi...

  10. Relativistic electron beam generator

    DOEpatents

    Mooney, L.J.; Hyatt, H.M.

    1975-11-11

    A relativistic electron beam generator for laser media excitation is described. The device employs a diode type relativistic electron beam source having a cathode shape which provides a rectangular output beam with uniform current density.

  11. Electron Beam Ablation of Metals

    NASA Astrophysics Data System (ADS)

    Kovaleski, S. D.; Gilgenbach, R. M.; Rintamaki, J. I.; Ang, L. K.; Spindler, H. L.; Cohen, W. E.; Lau, Y. Y.; Lash, J. S.

    1996-10-01

    An experiment has recently been devised for material ablation using a channelspark electron beam. The ultimate goal of this experiment is to deposit thin films by electron beam ablation. The channelspark is a pseudospark device developed by Forschungszentrum Karlsruhe (G. Muller, C. Schultheiss, Proc. of Beams, 2, 833(1994)) for production of high current, low energy electron beams. The channelspark has the following operating parameters: a 15-20kV accelerating potential and measured source current of <2000A. Initial experiments have concentrated on characterizing ion-focused electron beam current transport through the necessary background fill gas (typically 5-50 mTorr of Argon). Ablation of Al, Fe, and Ti is being studied with spectroscopy and electron beam current diagnostics. Physical beam target damage is also being investigated and compared to laser ablated targets. Simulations of electron transport and energy deposition are being conducted via the ITS-TIGER code (Sandia Report No. SAND 91-1634) developed at Sandia National Laboratory.

  12. Electron beam focusing system

    SciTech Connect

    Dikansky, N.; Nagaitsev, S.; Parkhomchuk, V.

    1997-09-01

    The high energy electron cooling requires a very cold electron beam. Thus, the electron beam focusing system is very important for the performance of electron cooling. A system with and without longitudinal magnetic field is presented for discussion. Interaction of electron beam with the vacuum chamber as well as with the background ions and stored antiprotons can cause the coherent electron beam instabilities. Focusing system requirements needed to suppress these instabilities are presented.

  13. Electron beam device

    DOEpatents

    Beckner, E.H.; Clauser, M.J.

    1975-08-12

    This patent pertains to an electron beam device in which a hollow target is symmetrically irradiated by a high energy, pulsed electron beam about its periphery and wherein the outer portion of the target has a thickness slightly greater than required to absorb the electron beam pulse energy. (auth)

  14. Comparative Study of Solid-Phase Crystallization of Amorphous Silicon Deposited by Hot-Wire CVD, Plasma-Enhanced CVD, and Electron-Beam Evaporation

    SciTech Connect

    Stradins, P.; Kunz, O.; Young, D. L.; Yan, Y.; Jones, K. M.; Xu, Y.; Reedy, R. C.; Branz, H. M.; Aberle, A. G.; Wang, Q.

    2007-01-01

    Solid-phase crystallization (SPC) rates are compared in amorphous silicon films prepared by three different methods: hot-wire chemical vapor deposition (HWCVD), plasma-enhanced chemical vapor deposition (PECVD), and electron-beam physical vapor deposition (e-beam). Random SPC proceeds approximately 5 and 13 times slower in PECVD and e-beam films, respectively, as compared to HWCVD films. Doping accelerates random SPC in e-beam films but has little effect on the SPC rate of HWCVD films. In contrast, the crystalline growth front in solid-phase epitaxy experiments propagates at similar speed in HWCVD, PECVD, and e-beam amorphous Si films. This strongly suggests that the observed large differences in random SPC rates originate from different nucleation rates in these materials while the grain growth rates are relatively similar. The larger grain sizes observed for films that exhibit slower random SPC support this suggestion.

  15. Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

    PubMed Central

    Szkudlarek, Aleksandra; Rodrigues Vaz, Alfredo; Zhang, Yucheng; Rudkowski, Andrzej; Kapusta, Czesław; Erni, Rolf; Moshkalev, Stanislav

    2015-01-01

    Summary In this paper we study in detail the post-growth annealing of a copper-containing material deposited with focused electron beam induced deposition (FEBID). The organometallic precursor Cu(II)(hfac)2 was used for deposition and the results were compared to that of compared to earlier experiments with (hfac)Cu(I)(VTMS) and (hfac)Cu(I)(DMB). Transmission electron microscopy revealed the deposition of amorphous material from Cu(II)(hfac)2. In contrast, as-deposited material from (hfac)Cu(I)(VTMS) and (hfac)Cu(I)(DMB) was nano-composite with Cu nanocrystals dispersed in a carbonaceous matrix. After annealing at around 150–200 °C all deposits showed the formation of pure Cu nanocrystals at the outer surface of the initial deposit due to the migration of Cu atoms from the carbonaceous matrix containing the elements carbon, oxygen, and fluorine. Post-irradiation of deposits with 200 keV electrons in a transmission electron microscope favored the formation of Cu nanocrystals within the carbonaceous matrix of freestanding rods and suppressed the formation on their surface. Electrical four-point measurements on FEBID lines from Cu(hfac)2 showed five orders of magnitude improvement in conductivity when being annealed conventionally and by laser-induced heating in the scanning electron microscope chamber. PMID:26425404

  16. (Pulsed electron beam precharger)

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1990-01-01

    This report discusses the following topics on electron beam guns: Precharger Modification; Installation of Charge vs. Radius Apparatus; High Concentration Aerosol Generation; and Data Acquisition and Analysis System.

  17. Electrochromic properties of manganese oxide (MnO{sub x}) thin films made by electron beam deposition

    SciTech Connect

    Erlandsson, O.; Lindvall, J.; Nguyen Ngoc Toan; Nguyen Van Hung; Vu Thi Bich; Nguyen Nang Dinh

    1993-12-31

    In recent years, considerable attention has been given to both the theoretical and the experimental investigation of the physical and physico-chemical properties of the chromogenics materials due their favorable and promising applications such as electrochromic devices, energy-efficient smart windows, automobile mirrors and building glazings. Electrochromic MnO{sub x} thin films were prepared by using an electron beam technique followed by annealing post-treatment. Electrochromic properties of the films were studied in three different solutions: 1M LiClO{sub 4} in propylene carbonate, KOH (pH = 10.5) and natrium borate (pH = 9.2). The transmittance spectra of the colored films combined with their cyclic voltammograms have showed that the enhancement of the electrochromic behavior of these films can be attributed to the insertion (or extraction) of the OH{sup {minus}} anions into (or from) the MnO{sub x} films. The best electrochromic efficiency of the films was obtained in the borate electrolyte.

  18. Pr and F co-doped SnO₂ transparent conductive films with high work function deposited by ion-assisted electron beam evaporation.

    PubMed

    Wu, Shaohang; Li, Yantao; Luo, Jinsong; Lin, Jie; Fan, Yi; Gan, Zhihong; Liu, Xingyuan

    2014-02-24

    A transparent conductive oxide (TCO) Pr and F co-doped SnO2 (PFTO) film is prepared by ion-assisted electron beam deposition. An optimized PFTO film shows a high average visible optical transmittance of 83.6% and a minimum electrical resistivity of 3.7 × 10(-3) Ω·cm corresponding to a carrier density of 1.298 × 10(20) cm(-3) and Hall mobility of 12.99 cm(2)/V⋅s. This PFTO film shows a high work function of 5.147 eV and favorable surface morphology with an average roughness of 1.45 nm. Praseodymium fluoride is found to be an effective material to dope F into SnO2 that can simplify the fabrication process of SnO2-based TCO films. PMID:24663792

  19. Conductance enhancement due to interface magnons in electron-beam evaporated MgO magnetic tunnel junctions with CoFeB free layer deposited at different pressure

    SciTech Connect

    Guo, P.; Yu, G. Q.; Wei, H. X.; Han, X. F. E-mail: xfhan@aphy.iphy.ac.cn; Li, D. L.; Feng, J. F. E-mail: xfhan@aphy.iphy.ac.cn; Kurt, H.; Chen, J. Y.; Coey, J. M. D.

    2014-10-21

    Electron-beam evaporated MgO-based magnetic tunnel junctions have been fabricated with the CoFeB free layer deposited at Ar pressure from 1 to 4 mTorr, and their tunneling process has been studied as a function of temperature and bias voltage. By changing the growth pressure, the junction dynamic conductance dI/dV, inelastic electron tunneling spectrum d²I/dV², and tunneling magnetoresistance vary with temperature. Moreover, the low-energy magnon cutoff energy E{sub C} derived from the conductance versus temperature curve agrees with interface magnon energy obtained directly from the inelastic electron tunneling spectrum, which demonstrates that interface magnons are involved in the electron tunneling process, opening an additional conductance channel and thus enhancing the total conductance.

  20. Dose and energy dependence of mechanical properties of focused electron-beam-induced pillar deposits from Cu(C5HF6O2)2.

    PubMed

    Friedli, V; Utke, I; Mølhave, K; Michler, J

    2009-09-23

    Bending and vibration tests performed inside a scanning electron microscope were used to mechanically characterize high aspect pillars grown by focused electron-beam- (FEB) induced deposition from the precursor Cu(C(5)HF(6)O(2))(2). Supported by finite element (FE) analysis the Young's modulus was determined from load-deflection measurements using cantilever-based force sensing and the material density from additional resonance vibration analysis. The pillar material consisted of a carbonaceous (C-, O-, F-, H-containing) matrix which embeds 5-10 at.% Cu deposited at 5 and 20 keV primary electron energy and 100 pA beam current, depending on primary electron energy. The Young's moduli of the FEB deposits increased from 17 +/- 6 to 25 +/- 8 GPa with increasing electron dose. The density of the carbonaceous matrix shows a dependence on the primary electron energy: 1.2 +/- 0.3 g cm(-3) (5 keV) and 2.2 +/- 0.5 g cm(-3) (20 keV). At a given primary energy a correlation with the irradiation dose is found. Quality factors determined from the phase relation at resonance of the fundamental pillar vibration mode were in the range of 150-600 and correlated to the deposited irradiation energy. PMID:19713594

  1. Effect of deposition temperature on electron-beam evaporated polycrystalline silicon thin-film and crystallized by diode laser

    SciTech Connect

    Yun, J. Varalmov, S.; Huang, J.; Green, M. A.; Kim, K.

    2014-06-16

    The effects of the deposition temperature on the microstructure, crystallographic orientation, and electrical properties of a 10-μm thick evaporated Si thin-film deposited on glass and crystallized using a diode laser, are investigated. The crystallization of the Si thin-film is initiated at a deposition temperature between 450 and 550 °C, and the predominant (110) orientation in the normal direction is found. Pole figure maps confirm that all films have a fiber texture and that it becomes stronger with increasing deposition temperature. Diode laser crystallization is performed, resulting in the formation of lateral grains along the laser scan direction. The laser power required to form lateral grains is higher in case of films deposited below 450 °C for all scan speeds. Pole figure maps show 75% occupancies of the (110) orientation in the normal direction when the laser crystallized film is deposited above 550 °C. A higher density of grain boundaries is obtained when the laser crystallized film is deposited below 450 °C, which limits the solar cell performance by n = 2 recombination, and a performance degradation is expected due to severe shunting.

  2. Nano-indentation of single-layer optical oxide thin films grown by electron-beam deposition

    SciTech Connect

    Mehrotra, K.; Oliver, J. B.; Lambropoulos, J. C.

    2015-01-01

    Mechanical characterization of optical oxide thin films is performed using nano-indentation, and the results are explained based on the deposition conditions used. These oxide films are generally deposited to have a porous microstructure that optimizes laser induced damage thresholds, but changes in deposition conditions lead to varying degrees of porosity, density, and possibly the microstructure of the thin film. This can directly explain the differences in the mechanical properties of the film studied here and those reported in literature. Of the four single-layer thin films tested, alumina was observed to demonstrate the highest values of nano-indentation hardness and elastic modulus. This is likely a result of the dense microstructure of the thin film arising from the particular deposition conditions used.

  3. Microstructural analysis and Transport Properties of MoO and MoC nanostructures prepared by focused electron beam-induced deposition

    NASA Astrophysics Data System (ADS)

    Makise, Kazumasa; Mitsuishi, Kazutaka; Shimojo, Masayuki; Shinozaki, Bunju

    2014-07-01

    By electron-beam-induced deposition, we have succeeded in the direct fabrication of nanowires of molybdenum oxide (MoOx) and molybdenum carbide (MoC) on a SiO2 substrate set in a scanning electron microscope. In order to prepare MoOx specimens of high purity, a precursor gas of molybdenum hexacarbonyl [Mo(CO)6] is used, mixed with oxygen gas. On the other hand, MoC is grown by mixing H2O gas with the precursor gas. The electrical transport properties of the nanowires are investigated by the DC four-terminal method. A highly resistive MoOx nanowire prepared from an as-deposited specimen by annealing in air shows nonlinear current-voltage characteristics and a high photoconductivity. The resistivity ρ of an as-deposited amorphous MoC (a-MoC) nanowire takes its maximum at a temperature T ~ 10 K and decreases to ~ 0 with decreasing temperature. This behavior of ρ(T) indicates the possible occurrence of superconductivity in a-MoC nanowires. The characteristic of ρ(T) below the superconducting transition temperature Tc ~ 4 K can be well explained by the quantum phase-slip model with a coherence length ξ(0) ~ 8 nm at T = 0.

  4. Microstructural analysis and Transport Properties of MoO and MoC nanostructures prepared by focused electron beam-induced deposition

    PubMed Central

    Makise, Kazumasa; Mitsuishi, Kazutaka; Shimojo, Masayuki; Shinozaki, Bunju

    2014-01-01

    By electron-beam-induced deposition, we have succeeded in the direct fabrication of nanowires of molybdenum oxide (MoOx) and molybdenum carbide (MoC) on a SiO2 substrate set in a scanning electron microscope. In order to prepare MoOx specimens of high purity, a precursor gas of molybdenum hexacarbonyl [Mo(CO)6] is used, mixed with oxygen gas. On the other hand, MoC is grown by mixing H2O gas with the precursor gas. The electrical transport properties of the nanowires are investigated by the DC four-terminal method. A highly resistive MoOx nanowire prepared from an as-deposited specimen by annealing in air shows nonlinear current-voltage characteristics and a high photoconductivity. The resistivity ρ of an as-deposited amorphous MoC (a-MoC) nanowire takes its maximum at a temperature T ≈ 10 K and decreases to ≈ 0 with decreasing temperature. This behavior of ρ(T) indicates the possible occurrence of superconductivity in a-MoC nanowires. The characteristic of ρ(T) below the superconducting transition temperature Tc ≈ 4 K can be well explained by the quantum phase-slip model with a coherence length ξ(0) ≈ 8 nm at T = 0. PMID:25033894

  5. Electron Induced Surface Reactions of cis-Pt(CO)2Cl2: A Route to Focused Electron Beam Induced Deposition of Pure Pt Nanostructures.

    PubMed

    Spencer, Julie A; Wu, Yung-Chien; McElwee-White, Lisa; Fairbrother, D Howard

    2016-07-27

    Using mechanistic data from surface science studies on electron-induced reactions of organometallic precursors, cis-Pt(CO)2Cl2 (1) was designed specifically for use in focused electron beam induced deposition (FEBID) of Pt nanostructures. Electron induced decomposition of adsorbed 1 under ultrahigh vacuum (UHV) conditions proceeds through initial CO loss as determined by in situ X-ray photoelectron spectroscopy and mass spectrometry. Although the Pt-Cl bonds remain intact during the initial decomposition step, larger electron doses induce removal of the residual chloride through an electron-stimulated desorption process. FEBID structures created from cis-Pt(CO)2Cl2 under steady state deposition conditions in an Auger spectrometer were determined to be PtCl2, free of carbon and oxygen. Coupled with the electron stimulated removal of chlorine demonstrated in the UHV experiments, the Auger deposition data establish a route to FEBID of pure Pt. Results from this study demonstrate that structure-activity relationships can be used to design new precursors specifically for FEBID. PMID:27346707

  6. Inclined Substrate Deposited CeO2 Films by Electron Beam Evaporation on Randomly Oriented Metallic Substrate

    NASA Astrophysics Data System (ADS)

    Mancini, A.; Celentano, G.; Fabbri, F.; Galluzzi, V.; Petrisor, T.; Rufoloni, A.; Varesi, E.; Vannozzi, A.; Rogai, R.; Boffa, V.; Gambardella, U.

    A study on CeO2 film growth on randomly oriented metallic substrate using lnclined Substrate Deposition (ISD) technique was performed in order to develop a biaxially aligned buffer layer for YBa2Cu3O7-δ (YBCO) coated conductors. The influence of deposition parameters, as the substrate inclination angle α with respect to the CeO2 vapor direction, deposition temperature and film thickness, on structural and morphological properties of the film was investigated. At substrate temperature between 200°C and 700°C a biaxial texture was observed for α ranging from 150° to 75°. The minimum value of the φ-scan full width at half maximum (FWHM) on (002) poles of about 13.5° was obtained for film 2 μm thick deposited at 200°C and α=55°. Morphological analyses on cross-sectioned samples revealed a columnar structure, typical for this deposition technique, with spaced grains and a tile like surface.

  7. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1989-01-01

    This is the fifth in a series of contracts and grants exploring the advanced particulate pollution control technology of electron beam precipitation. The chief goal of the current contract is to develop a laboratory scale electron beam precharger using a pulsed electric field to the proof-of-concept stage. Contract tasks leading to the achievement of this goal are generally divided up into two categories: tasks required to bring the Electron Beam Precipitator (EBP) test system up to an operational level for the contract work, and tasks concerning the actual experimental and analytical phase of the study. Not unexpectedly, the early portion of the contract duration will be devoted to the commissioning of the EBP and its many subsystems, while the latter portion will devote itself to testing the new pulsed electron beam precharger.

  8. Comparative analysis of electrophysical properties of ceramic tantalum pentoxide coatings, deposited by electron beam evaporation and magnetron sputtering methods

    NASA Astrophysics Data System (ADS)

    Donkov, N.; Mateev, E.; Safonov, V.; Zykova, A.; Yakovin, S.; Kolesnikov, D.; Sudzhanskaya, I.; Goncharov, I.; Georgieva, V.

    2014-12-01

    Ta2O5 ceramic coatings have been deposited on glass substrates by e-beam evaporation and magnetron sputtering methods. For the magnetron sputtering process Ta target was used. X-ray diffraction measurements show that these coatings are amorphous. XPS survey spectra of the ceramic Ta2O5 coatings were obtained. All spectra consist of well-defined XPS lines of Ta 4f, 4d, 4p and 4s; O 1s; C 1s. Ta 4f doublets are typical for Ta2O5 coatings with two main peaks. Scanning electron microscopy and atomic force microscopy images of the e-beam evaporated and magnetron sputtered Ta2O5 ceramic coatings have revealed a relatively flat surface with no cracks. The dielectric properties of the tantalum pentoxide coatings have been investigated in the frequency range of 100 Hz to 1 MHz. The electrical behaviour of e-beam evaporated and magnetron sputtered Ta2O5 ceramic coatings have also been compared. The deposition process conditions principally effect the structure parameters and electrical properties of Ta2O5 ceramic coatings. The coatings deposited by different methods demonstrate the range of dielectric parameters due to the structural and stoichiometric composition changes

  9. Dewetting behavior of electron-beam-deposited Au thin films on various substrates: graphenes, quartz, and SiO2 wafers

    NASA Astrophysics Data System (ADS)

    Lee, Seung-Hwan; Kwak, Eun-Hye; Jeong, Goo-Hwan

    2015-02-01

    We demonstrate the dewetting behavior of Au thin films on the following substrates: single- and multilayer mechanically exfoliated graphene, and SiO2 and ST-cut quartz wafers. The 1-nm-thick Au thin films were prepared by electron beam deposition. The mean sizes of the Au nanoparticles from as-deposited samples were 0.4, 0.9, 1.6, and 2.3 nm and increased after a 60-min annealing at 900 °C to 5.1, 6.4, 9.4, and 10.8 nm for SiO2, ST-cut quartz, mono- and bi-layer graphene, respectively. Conversely, the areal densities of the Au nanoparticles decreased in all substrates with increasing annealing time. The different sizes, areal densities, and morphological evolutions of the Au nanoparticles due to annealing on the different substrates imply different interfacial interactions between Au and each surface. In addition, it is worth noting that single-walled carbon nanotubes (SWNTs) can be grown using the dewetted Au nanoparticles on graphene-coated quartz substrates. Finally, the present work can contribute to not merely precise formation of Au nanoparticles via dewetting phenomenon but also surface modification of graphene and SWNT growth.

  10. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1991-01-01

    Electron beam precharging of a high resistivity aerosol was successfully performed under a range of experimental conditions during Quarter Six of the contract. The initial E-beam particle precharging experiments completed this term were designed to extend the efficiency of particle charging and collection using a fine, monodisperse aerosol at relatively large loadings in the FSU Electron Beam Precipitator wind tunnel. There are several reasons for doing this: (1) to re-establish a baseline performance criterion for comparison to other runs, (2) to test several recently upgraded or repaired subsystems, and (3) to improve upon the collection efficiency of the electron beam precipitator when testing precharging effectiveness with a very high resistivity, moderate-to-high dust concentration. In addition, these shakedown runs were used to determine a set of suitable operational parameters for the wind tunnel, the electrostatic collecting sections, and the MINACC E-beam accelerator. These parameters will normally be held constant while the precharging parameters are varied to produce an optimum particle charge. The electron beam precharging investigation performed during the period covered by Quarter Six used virtually the same experimental apparatus and procedures as in previous contract work, and these are described for review in this report. This investigation was part of an experimental effort which ran nearly continuously for nine months, encompassing work on the electrostatic collecting section, electron beam precharger, and particle charge-to-radius measuring apparatus. A summary of the work on dc electron beam precipitation is presented here.

  11. Growth direction of oblique angle electron beam deposited silicon monoxide thin films identified by optical second-harmonic generation

    SciTech Connect

    Vejling Andersen, Søren; Lund Trolle, Mads; Pedersen, Kjeld

    2013-12-02

    Oblique angle deposited (OAD) silicon monoxide (SiO) thin films forming tilted columnar structures have been characterized by second-harmonic generation. It was found that OAD SiO leads to a rotationally anisotropic second-harmonic response, depending on the optical angle of incidence. A model for the observed dependence of the second-harmonic signal on optical angle of incidence allows extraction of the growth direction of OAD films. The optically determined growth directions show convincing agreement with cross-sectional scanning electron microscopy images. In addition to a powerful characterization tool, these results demonstrate the possibilities for designing nonlinear optical devices through SiO OAD.

  12. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1990-01-01

    Electrostatic collection of a high resistivity aerosol using the Electron Beam Precipitator (EBP) collecting section was demonstrated during this reporting period (Quarter Five). Collection efficiency experiments were designed to confirm and extend some of the work performed under the previous contract. The reason for doing this was to attempt to improve upon the collection efficiency of the precipitator alone when testing with a very high resistivity, moderate-to-high concentration dust load. From the collector shakedown runs, a set of suitable operational parameters were determined for the downstream electrostatic collecting sections of the Electron Beam Precipitator wind tunnel. These parameters, along with those for the MINACC electron beam, will generally be held constant while the numerous precharging parameters are varied to produce an optimum particle charge. The electrostatic collector experiments were part of a larger, comprehensive investigation on electron beam precharging of high resistivity aerosol particles performed during the period covered by Quarters Five, Six, and Seven. This body of work used the same experimental apparatus and procedures and the experimental run period lasted nearly continuously for six months. A summary of the Quarter Five work is presented in the following paragraphs. Section II-A of TPR 5 contains a report on the continuing effort which was expended on the modification and upgrade of the pulsed power supply and the monitoring systems prior to the initiation of the electron beam precharging experimental work.

  13. Influence of the shape and surface oxidation in the magnetization reversal of thin iron nanowires grown by focused electron beam induced deposition

    PubMed Central

    Córdoba, Rosa; Magén, César; Snoeck, Etienne; Koopmans, Bert

    2015-01-01

    Summary Iron nanostructures grown by focused electron beam induced deposition (FEBID) are promising for applications in magnetic sensing, storage and logic. Such applications require a precise design and determination of the coercive field (H C), which depends on the shape of the nanostructure. In the present work, we have used the Fe2(CO)9 precursor to grow iron nanowires by FEBID in the thickness range from 10 to 45 nm and width range from 50 to 500 nm. These nanowires exhibit an Fe content between 80 and 85%, thus giving a high ferromagnetic signal. Magneto-optical Kerr characterization indicates that H C decreases for increasing thickness and width, providing a route to control the magnetization reversal field through the modification of the nanowire dimensions. Transmission electron microscopy experiments indicate that these wires have a bell-type shape with a surface oxide layer of about 5 nm. Such features are decisive in the actual value of H C as micromagnetic simulations demonstrate. These results will help to make appropriate designs of magnetic nanowires grown by FEBID. PMID:26199835

  14. Influence of the shape and surface oxidation in the magnetization reversal of thin iron nanowires grown by focused electron beam induced deposition.

    PubMed

    Rodríguez, Luis A; Deen, Lorenz; Córdoba, Rosa; Magén, César; Snoeck, Etienne; Koopmans, Bert; De Teresa, José M

    2015-01-01

    Iron nanostructures grown by focused electron beam induced deposition (FEBID) are promising for applications in magnetic sensing, storage and logic. Such applications require a precise design and determination of the coercive field (H C), which depends on the shape of the nanostructure. In the present work, we have used the Fe2(CO)9 precursor to grow iron nanowires by FEBID in the thickness range from 10 to 45 nm and width range from 50 to 500 nm. These nanowires exhibit an Fe content between 80 and 85%, thus giving a high ferromagnetic signal. Magneto-optical Kerr characterization indicates that H C decreases for increasing thickness and width, providing a route to control the magnetization reversal field through the modification of the nanowire dimensions. Transmission electron microscopy experiments indicate that these wires have a bell-type shape with a surface oxide layer of about 5 nm. Such features are decisive in the actual value of H C as micromagnetic simulations demonstrate. These results will help to make appropriate designs of magnetic nanowires grown by FEBID. PMID:26199835

  15. Electrochemical performance of gadolinia-doped ceria (CGO) electrolyte thin films for ITSOFC deposited by spray pyrolysis

    NASA Astrophysics Data System (ADS)

    Reolon, Raquel Pereira; Halmenschlager, Cibele Melo; Neagu, Roberto; de Fraga Malfatti, Célia; Bergmann, Carlos Pérez

    2014-09-01

    Solid Oxide Fuel Cell is an attractive, efficient, alternative source of power generation. However several challenges remained for this technology to be viable. These challenges include high power density, degradation rate, and cost. One way to decrease the SOFC cost is to use stainless steel interconnector. To be able to use a stainless steel interconnector one of the challenges is to find a way to produce an electrolyte, which does not need sintering at high temperature. This work presents the results of the process applied to gadolinia-doped ceria thin films deposited in cycles by spray pyrolysis. The aim of this work was to obtain thin, dense, and continuous CGO coatings, which has electrochemical performance suitable to be used as electrolyte for SOFC. The results obtained show that the air flow rate influenced the droplets size and hence the film quality. X-ray diffraction analysis showed that the films were crystalline after the deposition. Electrochemical tests showed maximum power density of 510 mW cm-2 at 650 °C with a thickness average of 3.30 μm when the film was deposited in 12 cycles showing that the film has a potential to be used as an electrolyte for ITSOFC on metal support.

  16. Maskless and resist-free rapid prototyping of three-dimensional structures through electron beam induced deposition (EBID) of carbon in combination with metal-assisted chemical etching (MaCE) of silicon.

    PubMed

    Rykaczewski, Konrad; Hildreth, Owen J; Kulkarni, Dhaval; Henry, Matthew R; Kim, Song-Kil; Wong, Ching Ping; Tsukruk, Vladimir V; Fedorov, Andrei G

    2010-04-01

    In this work, we introduce a maskless, resist-free rapid prototyping method to fabricate three-dimensional structures using electron beam induced deposition (EBID) of amorphous carbon (aC) from a residual hydrocarbon precursor in combination with metal-assisted chemical etching (MaCE) of silicon. We demonstrate that EBID-made patterned aC coating, with thickness of even a few nanometers, acts as a negative "mask" for the etching process and is sufficient for localized termination of the MaCE of silicon. Optimal aC deposition settings and gold film thickness for fabrication of high-aspect-ratio nanoscale 3D silicon structures are determined. The speed necessary for optimal aC feature deposition is found to be comparable to the writing speed of standard Electron Beam Lithography and the MaCE etching rate is found to be comparable to standard deep reactive ion etching (DRIE) rate. PMID:20356053

  17. Electron beam pumping of CdZnSe quantum well laser structures using a variable energy electron beam

    NASA Astrophysics Data System (ADS)

    Trager-Cowan, C.; Bagnall, D. M.; McGow, F.; McCallum, W.; O'Donnell, K. P.; Smith, P. C.; Wright, P. J.; Cockayne, B.; Prior, K. A.; Mullins, J. T.; Horsburgh, G.; Cavenett, B. C.

    1996-02-01

    In this paper we present experimental results on electron beam pumping of MBE and MOVPE lasers with CdZnSe single quantum wells. Laser emission in the gree and blue occurs under pulsed excitation, with threshold power densities typically less than 2 kW/cm 2 at low temperatures. Threshold curves obtained at different electron beam energies show that there is an optimum electron beam energy for wells at a given depth below the surface. This suggests that it is possible to match the electron beam energy to a given structure. Results are broadly consistent with Monte Carlo calculations of the depth dependence of the energy deposition of the electron beam.

  18. Sheet electron beam tester

    NASA Astrophysics Data System (ADS)

    Spear, Alexander Grenbeaux

    The DARPA HiFIVE project uses a pulsed electron sheet beam gun to power a traveling wave tube amplifier operating at 220 GHz. Presented is a method for characterizing the high current density 0.1 mm by 1 mm sheet electron beam. A tungsten tipped probe was scanned through the cross section of the sheet electron beam inside of a vacuum vessel. The probe was controlled with sub-micron precision using stepper motors and LabView computer control while boxcar averaging hardware sampled the pulsed beam. Matlab algorithms were used to interpret the data, calculate beam dimensions and current density, and create 2-dimensional cross section images. Full characterization of two separate HiFIVE sheet electron guns was accomplished and is also presented.

  19. Landsat electron beam recorder

    NASA Astrophysics Data System (ADS)

    Grosso, P. F.; Whitley, J. P.

    A minicomputer-controlled electron beam recorder (EBR) presently in use at the Brazilian Government's Institute De Pesquisas Espaclais (INPE) satellite ground station is described. This 5-in.-film-size EBR is used to record both Landsat and SPOT satellite imagery in South America. A brief electron beam recorder technology review is presented. The EBR is capable of recording both vector and text data from computer-aided design, publishing, and line art systems and raster data from image scanners, raster image processors (RIPS), halftone/screen generators, and remote image sensors. A variety of image formats may be recorded on numerous film sizes (16 mm, 35 mm, 70 mm, 105 mm, 5-in, 5.5-in., and 9.5-in.). These recordings are used directly or optically enlarged depending on the final product.

  20. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1991-01-01

    Electron beam precharging of a high resistivity aerosol was successfully demonstrated during this reporting period (Quarters Five and Six). The initial E-beam particle precharging experiments completed this term were designed to confirm and extend some of the work performed under the previous contract. There are several reasons for doing this: (1) to re-establish a baseline performance criterion for comparison to other runs, (2) to test several recently upgraded or repaired subsystems, and (3) to improve upon the collection efficiency of the electron beam precipitator when testing precharging effectiveness with a very high resistivity, moderate-to-high concentration dust load. In addition, these shakedown runs were used to determine a set of suitable operational parameters for the wind tunnel, the electrostatic collecting sections, and the MINACC E-beam accelerator. These parameters will generally be held constant while the precharging parameters are varied to produce an optimum particle charge.

  1. Pulsed electron beam precharger

    NASA Astrophysics Data System (ADS)

    Finney, W. C.

    A short review of electron beam particle precharging using a pulsed electric field is presented. The design and installation is detailed of a remote focusing gear train which will allow much greater control over the particle charge measurement capability of the charge vs. radius apparatus. Progress on the electrical shielding of the rotating spark gap power supply using a large Faraday cage is described. Efforts to prevent RFI interference from adversely affecting the Climet particle counter and the MicroMac current measurement device using a variety of techniques are also presented. The basic effort is to optimize the removal efficiency for fly ash particles.

  2. Plasma and ion barrier for electron beam spot stability

    SciTech Connect

    Kwan, Thomas J. T.; Snell, Charles M.

    2000-03-01

    High-current electron beams of small spot size are used for high-resolution x-ray radiography of dense objects. Intense energy deposition in the bremsstrahlung target causes generation of ions which can propagate upstream and disrupt the electron beam. We have investigated the use of a thin beryllium foil placed 1-2 cm in front of the target, which serves as a barrier for the ions but is essentially transparent to the incoming electron beam. Analysis and computer simulations confirm that this confinement method will halt ion propagation and preserve the spot size stability of the electron beam. (c) 2000 American Institute of Physics.

  3. Composite ceria-coated aerogels and methods of making the same

    DOEpatents

    Eyring, Edward M; Ernst, Richard D; Turpin, Gregory C; Dunn, Brian C

    2013-05-07

    Ceria-coated aerogels can include an aerogel support material having a stabilized ceria coating thereon. The ceria coating can be formed by solution or vapor deposition of alcogels or aerogels. Additional catalytic metal species can also be incorporated into the coating to form multi-metallic compounds having improved catalytic activity. Further, the ceria coated aerogels retain high surface areas at elevated temperatures. Thus, improvements in catalytic activity and thermal stability can be achieved using these ceria-coated composite aerogels.

  4. Repetitively pumped electron beam device

    DOEpatents

    Schlitt, L.G.

    1979-07-24

    Disclosed is an apparatus for producing fast, repetitive pulses of controllable length of an electron beam by phased energy storage in a transmission line of length matched to the number of pulses and specific pulse lengths desired. 12 figs.

  5. Electron Beam Dump Particle Search

    SciTech Connect

    Crisler, M.; Fenker, H.; Leedom, I.; Pordes, S.; /Fermilab

    1986-05-30

    The debate over the existence of a new particle postulated to explain the narrow positron spectra seen in heavy ion collisions has focused attention on a region of mass/lifetime where such a particle may exist and yet would not have been seen. To obtain the best possible sensitivity to elementary particles coupling to the electron in this unexplored region, we propose an electron beam dump experiment which will make parasitic use of the newly constructed wide band electron beam.

  6. Comparison of the Failures during Cyclic Oxidation of Yttria-Stabilized (7 to 8 Weight Percent) Zirconia Thermal Barrier Coatings Fabricated via Electron Beam Physical Vapor Deposition and Air Plasma Spray

    NASA Astrophysics Data System (ADS)

    Yanar, N. M.; Helminiak, M.; Meier, G. H.; Pettit, F. S.

    2011-04-01

    The failures during oxidation of electron beam physical vapor deposition (EBPVD) and air plasma spray (APS) yttria-stabilized zirconia (YSZ) thermal barrier coatings (TBCs) on different bond coats, namely, platinum-modified aluminide and NiCoCrAlY, are described. It is shown that oxidation of the bond coats, along with defects existing near the TBC/bond coat interface, plays a very important role in TBC failures. Procedures to improve TBC performance via modifying the oxidation characteristics of the bond coats and removing the as-processed defects are discussed. The influence of exposure conditions on TBC lives is described and factors such as cycle frequency and thermal gradients are discussed.

  7. Electron beam ion source and electron beam ion trap (invited)

    SciTech Connect

    Becker, Reinard; Kester, Oliver

    2010-02-15

    The electron beam ion source (EBIS) and its trap variant [electron beam ion trap (EBIT)] celebrated their 40th and 20th anniversary, respectively, at the EBIS/T Symposium 2007 in Heidelberg. These technologically challenging sources of highly charged ions have seen a broad development in many countries over the last decades. In contrast to most other ion sources the recipe of improvement was not ''sorcery'' but a clear understanding of the physical laws and obeying the technological constraints. This review will report important achievements of the past as well as promising developments in the future.

  8. Electron beam pumped semiconductor laser

    NASA Technical Reports Server (NTRS)

    Hug, William F. (Inventor); Reid, Ray D. (Inventor)

    2009-01-01

    Electron-beam-pumped semiconductor ultra-violet optical sources (ESUVOSs) are disclosed that use ballistic electron pumped wide bandgap semiconductor materials. The sources may produce incoherent radiation and take the form of electron-beam-pumped light emitting triodes (ELETs). The sources may produce coherent radiation and take the form of electron-beam-pumped laser triodes (ELTs). The ELTs may take the form of electron-beam-pumped vertical cavity surface emitting lasers (EVCSEL) or edge emitting electron-beam-pumped lasers (EEELs). The semiconductor medium may take the form of an aluminum gallium nitride alloy that has a mole fraction of aluminum selected to give a desired emission wavelength, diamond, or diamond-like carbon (DLC). The sources may be produced from discrete components that are assembled after their individual formation or they may be produced using batch MEMS-type or semiconductor-type processing techniques to build them up in a whole or partial monolithic manner, or combination thereof.

  9. Shimmed electron beam welding process

    DOEpatents

    Feng, Ganjiang; Nowak, Daniel Anthony; Murphy, John Thomas

    2002-01-01

    A modified electron beam welding process effects welding of joints between superalloy materials by inserting a weldable shim in the joint and heating the superalloy materials with an electron beam. The process insures a full penetration of joints with a consistent percentage of filler material and thereby improves fatigue life of the joint by three to four times as compared with the prior art. The process also allows variable shim thickness and joint fit-up gaps to provide increased flexibility for manufacturing when joining complex airfoil structures and the like.

  10. The effect of Si content on structure and mechanical features of silicon-containing calcium-phosphate-based films deposited by RF-magnetron sputtering on titanium substrate treated by pulsed electron beam

    NASA Astrophysics Data System (ADS)

    Surmeneva, M.; Tyurin, A.; Mukhametkaliyev, T.; Teresov, A.; Koval, A.; Pirozhkova, T.; Shuvarin, I.; Chudinova, E.; Surmenev, R.

    2015-11-01

    Silicon-containing calcium phosphate (Si-CaP) coatings were fabricated by radio frequency (rf) magnetron sputtering using the targets prepared from hydroxyapatite (HA) powder with different silicon content. A powder of Si-HA (Ca10(PO4)6-x(SiO4)x(OH)2-x, x=0.5 and 1.72) was prepared by mechanochemical activation and then used as a precursor-powder to prepare a target for sputtering. The titanium substrate was acid etched and treated with pulsed electron beam with an energy density of 15 J/cm2. The average crystallite size as determined by XRD was 28 nm for the coatings obtained using the target prepared from the Si-HA powder (x=0.5), whereas Si-CaP (Si-HA powder x=1.72) films showed an amorphous structure. The nanohardness and the Young's modulus of the Si-CaP coating (x=0.5) deposited on titanium treated by pulsed electron beam are enhanced to 4.5 and 113 GPa compared to titanium substrate. Increase of Si content resulted in a dramatic decrease of the nanohardness and Young's modulus of Si-CaP films. However, Si-CaP coatings with the highest Si content revealed significantly lower values of elastic modulus, but slightly higher values of H/E and H3/E2 than did the non-coated specimens. Rf-magnetron sputtering allowed us to produce Si- CaP coatings with higher nanohardness and lower elastic modulus compared to titanium substrate.

  11. Depressed collector for electron beams

    NASA Technical Reports Server (NTRS)

    Ives, R. Lawrence (Inventor)

    2005-01-01

    A depressed collector for recovery of spent beam energy from electromagnetic sources emitting sheet or large aspect ration annular electron beams operating aver a broad range of beam voltages and currents. The collector incorporates a trap for capturing and preventing the return of reflected and secondary electrons.

  12. Comparative Electrical Study on n-Type Cd1-XSeX and CdSe Thin Films Deposited by Electron Beam Evaporation Technique

    NASA Astrophysics Data System (ADS)

    Verma, Aneet Kumar; Tripathi, Ravishankar Nath; Vishwakarma, Rahul S. R.

    2011-10-01

    Since the last two decades, in the area of electronics, group II-VI compounds have drawn considerable interest due to their various applications. Cadmium selenide (CdSe), a member of this group, is one of the promising semiconducting material from its application point of view. The n-type Cd1-XSeX and CdSe films have been deposited onto ultra cleaned glass substrates by electron bean evaporated technique under 10-5 torr vacuum. The n-type Cd1-XSeX thin films has confirmed by Hall effect data. The resistivity of the film has been determined by I-V measurement using four probe setup. It is observed that the resistivity decreases with increases Cd/Se ratio and we found that n-type Cd1-XSeX thin films is more better than CdSe thin films.

  13. Collimation with hollow electron beams.

    PubMed

    Stancari, G; Valishev, A; Annala, G; Kuznetsov, G; Shiltsev, V; Still, D A; Vorobiev, L G

    2011-08-19

    A novel concept of controlled halo removal for intense high-energy beams in storage rings and colliders is presented. It is based on the interaction of the circulating beam with a 5-keV, magnetically confined, pulsed hollow electron beam in a 2-m-long section of the ring. The electrons enclose the circulating beam, kicking halo particles transversely and leaving the beam core unperturbed. By acting as a tunable diffusion enhancer and not as a hard aperture limitation, the hollow electron beam collimator extends conventional collimation systems beyond the intensity limits imposed by tolerable losses. The concept was tested experimentally at the Fermilab Tevatron proton-antiproton collider. The first results on the collimation of 980-GeV antiprotons are presented. PMID:21929171

  14. Continuum models of focused electron beam induced processing

    PubMed Central

    Lobo, Charlene; Friedli, Vinzenz; Szkudlarek, Aleksandra; Utke, Ivo

    2015-01-01

    Summary Focused electron beam induced processing (FEBIP) is a suite of direct-write, high resolution techniques that enable fabrication and editing of nanostructured materials inside scanning electron microscopes and other focused electron beam (FEB) systems. Here we detail continuum techniques that are used to model FEBIP, and release software that can be used to simulate a wide range of processes reported in the FEBIP literature. These include: (i) etching and deposition performed using precursors that interact with a surface through physisorption and activated chemisorption, (ii) gas mixtures used to perform simultaneous focused electron beam induced etching and deposition (FEBIE and FEBID), and (iii) etch processes that proceed through multiple reaction pathways and generate a number of reaction products at the substrate surface. We also review and release software for Monte Carlo modeling of the precursor gas flux which is needed as an input parameter for continuum FEBIP models. PMID:26425405

  15. Electron beam modeling on LTX

    NASA Astrophysics Data System (ADS)

    Szalkowski, Gregory; Majeski, Richard; Schmitt, John

    2014-10-01

    The lithium tokamak experiment (LTX) is a low aspect ratio tokamak with a steel clad copper shell that can be heated to 300-400 °C and coated with lithium. The lithium coating has been shown to decrease impurities in the plasma and decrease the recycling coefficient, improving plasma performance. The coating is applied to the walls by heating the shells, then using an electron beam to evaporate a pool of lithium located at the bottom of the shell. The beam is steered using the magnetic field generated by the field coils. This method allows for rapid evaporation of the lithium, producing a 50-100 nm coating in approximately 5 minutes. The current electron beam system can only coat half of the shell surface. A new electron beam system has been installed on LTX to coat the remaining shell surface. A model of this electron gun has been created using the AMaze program series (Field Precision LCC). The model will be used to find the magnetic fields needed to steer the electron beam produced by the gun to the lithium pool. The model will also show the electropotential produced both at the electron gun head and in the vessel. The model may also be used to find the dispersion of the beam and therefore the effective power density of the beam as it impacts the lithium pool. Supported by US DOE Contracts DE-AC02-09CH11466 and DE-AC52-07NA27344 and in part by the U.S. Department of Energy, Office of Science, Office of Workforce Development for Teachers and Scientists (WDTS) under the Science Undergraduate Laboratory Internship.

  16. Practical Teaching about Electron Beams

    ERIC Educational Resources Information Center

    Strawson, R. J.

    2009-01-01

    If you have seen tubes like the ones we describe here in the back of a cupboard but have been reluctant to use them, now is the time to get them out. The aim of this article is to record the history of teaching about electron beams, particularly with Teltron equipment, and in doing so encourage those schools that are equipped with these tubes to…

  17. APPARATUS FOR ELECTRON BEAM HEATING CONTROL

    DOEpatents

    Jones, W.H.; Reece, J.B.

    1962-09-18

    An improved electron beam welding or melting apparatus is designed which utilizes a high voltage rectifier operating below its temperature saturation region to decrease variations in electron beam current which normally result from the gas generated in such apparatus. (AEC)

  18. Light modulated electron beam driven radiofrequency emitter

    DOEpatents

    Wilson, M.T.; Tallerico, P.J.

    1979-10-10

    The disclosure relates to a light modulated electron beam-driven radiofrequency emitter. Pulses of light impinge on a photoemissive device which generates an electron beam having the pulse characteristics of the light. The electron beam is accelerated through a radiofrequency resonator which produces radiofrequency emission in accordance with the electron, hence, the light pulses.

  19. Copper-ceria interaction: A combined photoemission and DFT study

    NASA Astrophysics Data System (ADS)

    Szabová, Lucie; Skála, Tomáš; Matolínová, Iva; Fabris, Stefano; Farnesi Camellone, Matteo; Matolín, Vladimír

    2013-02-01

    Stoichiometric and partially reduced ceria films were deposited on preoxidized Ru(0 0 0 1) crystal by Ce evaporation in oxygen atmosphere of different pressures at 700 K. Copper-ceria interaction was investigated by deposition of metalic copper on both types of substrate. The samples were characterized by low energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) of core states and resonant photoelectron spectroscopy (RPES) of the valence bands. Copper adsorption on stoichiometric ceria caused reduction of CeO2, while on the oxygen-defficient ceria it partially reoxidized the substrate. This is in agreement with DFT+U calculations of copper adsorption on stoichiometric and defective ceria surfaces.

  20. Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation

    NASA Astrophysics Data System (ADS)

    Ristau, Detlev; Gunster, Stefan; Bosch, Salvador; Duparre, Angela; Masetti, Enrico; Ferre-Borrull, Josep; Kiriakidis, George; Peiro, Francesca; Quesnel, Etienne; Tikhonravov, Alexander

    2002-06-01

    Single layers of MgF2 and LaF3 were deposited upon superpolished fused-silica and CaF2 substrates by ion-beam sputtering (IBS) as well as by boat and electron beam (e-beam) evaporation and were characterized by a variety of complementary analytical techniques. Besides undergoing photometric and ellipsometric inspection, the samples were investigated at 193 and 633 nm by an optical scatter measurement facility. The structural properties were assessed with atomic-force microscopy, x-ray diffraction, TEM techniques that involved conventional thinning methods for the layers. For measurement of mechanical stress in the coatings, special silicon substrates were coated and analyzed. The dispersion behavior of both deposition materials, which was determined on the basis of various independent photometric measurements and data reduction techniques, is in good agreement with that published in the literature and with the bulk properties of the materials. The refractive indices of the MgF2 coatings ranged from 1.415 to 1.440 for the wavelength of the ArF excimer laser (193 nm) and from 1.435 to 1.465 for the wavelength of the F2 excimer laser (157 nm). For single layers of LaF3 the refractive indices extended from 1.67 to 1.70 at 193 nm to approx1.80 at 157 nm. The IBS process achieves the best homogeneity and the lowest surface roughness values (close to 1 nmrms) of the processes compared in the joint experiment. In contrast to MgF2 boat and e-beam evaporated coatings, which exhibit tensile mechanical stress ranging from 300 to 400 MPa, IBS coatings exhibit high compressive stress of as much as 910 MPa. A similar tendency was found for coating stress in LaF3 single layers. Experimental results are discussed with respect to the microstructural and compositional properties as well as to the surface topography of the coatings.

  1. Silicon nanocrystal growth under irradiation of electron beam

    PubMed Central

    Huang, Wei-Qi; Liu, Shi-Rong; Huang, Zhong-Mei; Dong, Tai-Ge; Wang, Gang; Qin, Cao-Jian

    2015-01-01

    In our experiment, it was observed that silicon nanocrystal rapidly grows with irradiation of electron beam on amorphous silicon film prepared by pulsed laser deposition, and shape of silicon nanocrystal is usually sphere in smaller nanoscale with less exposure time under electron beam, in which the quantum dots are prepared in nanoscale near 3 nm. In the electron interaction process, it was investigated that the various crystals structures in different orientations occur in the same time and the condensed structures of silicon nanocrystal are changed with different impurity atoms in silicon film. PMID:26608069

  2. Vortices in relativistic electron beams

    PubMed

    Jovanovic; Fedele; Shukla

    2000-08-01

    We demonstrate that a relativistic electron beam is properly described in the moving frame by the electron-magnetohydrodynamic equations of plasma physics. For large beam currents, the accelerator magnetic field is expected to be unstable to the fast magnetic reconnection. We present a plausible saturated state of the fast reconnection, in the form of a complex vortex pattern. The nonlinear dispersion equations of the vortex are derived and the relationship between the vortex structure and the background magnetic field is discussed. PMID:11088759

  3. Plasma and ion barrier for electron beam spot stability

    SciTech Connect

    Kwan, T.J.T.; Snell, C.M.

    1999-04-01

    The concept of a self-biased target to spatially confine the ions generated by the bombardment of intense electron beams on bremsstrahlung conversion targets has been predicted by computer simulation and further verified by experiments at the Integrated Test Stand for DARHT at Los Alamos National Laboratory. This technical article reports an alternative method of containing the plasmas and ions from the bremsstrahlung conversion target if the energy density of the electron beam is below a certain threshold. With the proposed changes of the electron beam parameters of the second axis of DARHT, the authors are able to show that a thin (0.5 mm) metallic barrier such as pure beryllium, or boron carbide with desirable thermal properties, is sufficiently transparent to the 20 MeV DARHT beam and at the same time able to confine the ions between the target and the barrier foil. The temperature rise in the foil due to energy deposited by the electron beam is expected to be below the melting point of the materials for the first three pulses. More important, they have shown in their time dependent particle-in-cell simulations that the deployment of a barrier situated 1 to 2 cm away from the converter target can achieve the ion confinement needed for the stability of the electron beam spot.

  4. Reinforcing multiwall carbon nanotubes by electron beam irradiation

    SciTech Connect

    Duchamp, Martial; Meunier, Richard; Smajda, Rita; Mionic, Marijana; Forro, Laszlo; Magrez, Arnaud; Seo, Jin Won; Song, Bo; Tomanek, David

    2010-10-15

    We study the effect of electron beam irradiation on the bending modulus of multiwall carbon nanotubes grown by chemical vapor deposition. Atomic force microscopy observations of the nanotube deflection in the suspended-beam geometry suggest an internal, reversible stick-slip motion prior to irradiation, indicating presence of extended defects. Upon electron beam irradiation, nanotubes with an initial bending modulus exceeding 10 GPa initially get stiffer, before softening at high doses. Highly defective nanotubes with smaller initial bending moduli do not exhibit the initial reinforcement. These data are explained by ab initio molecular dynamics calculations suggesting a spontaneous cross-linking of neighboring nanotube walls at extended vacancy defects created by the electron beam, in agreement with electron microscopy observations. At low defect concentration, depending on the edge morphology, the covalent bonds between neighboring nanotube walls cause reinforcement by resisting relative motion of neighboring walls. At high concentration of defects that are present initially or induced by high electron beam dose, the structural integrity of the entire system suffers from increasing electron beam damage.

  5. Synthesis and characterization of titanium carbide, titanium boron carbonitride, titanium boride/titanium carbide and titanium carbide/chromium carbide multilayer coatings by reactive and ion beam assisted, electron beam-physical vapor deposition (EB-PVD)

    NASA Astrophysics Data System (ADS)

    Wolfe, Douglas Edward

    The purpose of the present work was to investigate the synthesis of titanium carbide, TiBCN, TiB2/TiC and TiC/Cr23C6 multilayer coatings by several methods of electron beam-physical vapor deposition (EB-PVD) and examine the affects of various processing parameters on the properties and microstructures of the coatings. TiC was successfully deposited by reactive ion beam assisted (RIBA), EB-PVD and the results were compared to various titanium carbide coatings deposited by a variety of techniques. The affects of substrate temperature and ion beam current density were correlated with composition, hardness, changes in the lattice parameter, degree of crystallographic texture, residual stress, surface morphology, and microstructure. The average Vicker's hardness number was found to increase with increasing ion beam current density and increase over the substrate temperature range of 250°C to 650°C. The average Vicker's hardness number decreased at a substrate temperature of 750°C as a result of texturing and microstructure. The present investigation shows that the average Vicker's hardness number is not only a function of the composition, but also the microstructure including the degree of crystallographic texture. TiB2/TiC multilayer coatings were deposited by argon ion beam assisted, EB-PVD with varying number of total layers to two different film thicknesses under slightly different deposition conditions. In both cases, the hardness of the coatings increased with increasing number of total layers. The adhesion of the coatings ranged from 30 N to 50 N, with the better adhesion values obtained with the thinner coatings. The crystallographic texture coefficients of both the TiC and TiB2 layers were found to change with increasing number of total layers. The multilayer design was found to significantly affect the microstructure and grain size of the deposited coatings. The fracture toughness was found to decrease with increasing number of total layers and was

  6. Modern developments in electron-beam fluorescence

    NASA Astrophysics Data System (ADS)

    Cattolica, Robert J.

    Recent developments in the area of electron-beam fluorescence are discussed with special attention given to the experience in the use of the electron-beam fluorescence in flight research. A new measurement approach, called electron-photon fluorescence (EPF), is described, and it is shown that EPF offers the potential of overcoming some of the disadvantages of electron-beam fluorescence in high-density flows. Examples of using the EPF technique are presented.

  7. Modern developments in electron-beam fluorescence

    NASA Technical Reports Server (NTRS)

    Cattolica, Robert J.

    1991-01-01

    Recent developments in the area of electron-beam fluorescence are discussed with special attention given to the experience in the use of the electron-beam fluorescence in flight research. A new measurement approach, called electron-photon fluorescence (EPF), is described, and it is shown that EPF offers the potential of overcoming some of the disadvantages of electron-beam fluorescence in high-density flows. Examples of using the EPF technique are presented.

  8. Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation.

    PubMed

    Ristau, Detlev; Günster, Stefan; Bosch, Salvador; Duparré, Angela; Masetti, Enrico; Ferré-Borrull, Josep; Kiriakidis, George; Peiró, Francesca; Quesnel, Etienne; Tikhonravov, Alexander

    2002-06-01

    Single layers of MgF2 and LaF3 were deposited upon superpolished fused-silica and CaF2 substrates by ion-beam sputtering (IBS) as well as by boat and electron beam (e-beam) evaporation and were characterized by a variety of complementary analytical techniques. Besides undergoing photometric and ellipsometric inspection, the samples were investigated at 193 and 633 nm by an optical scatter measurement facility. The structural properties were assessed with atomic-force microscopy, x-ray diffraction, TEM techniques that involved conventional thinning methods for the layers. For measurement of mechanical stress in the coatings, special silicon substrates were coated and analyzed. The dispersion behavior of both deposition materials, which was determined on the basis of various independent photometric measurements and data reduction techniques, is in good agreement with that published in the literature and with the bulk properties of the materials. The refractive indices of the MgF2 coatings ranged from 1.415 to 1.440 for the wavelength of the ArF excimer laser (193 nm) and from 1.435 to 1.465 for the wavelength of the F2 excimer laser (157 nm). For single layers of LaF3 the refractive indices extended from 1.67 to 1.70 at 193 nm to approximately 1.80 at 157 nm. The IBS process achieves the best homogeneity and the lowest surface roughness values (close to 1 nm(rms)) of the processes compared in the joint experiment. In contrast to MgF2 boat and e-beam evaporated coatings, which exhibit tensile mechanical stress ranging from 300 to 400 MPa, IBS coatings exhibit high compressive stress of as much as 910 MPa. A similar tendency was found for coating stress in LaF3 single layers. Experimental results are discussed with respect to the microstructural and compositional properties as well as to the surface topography of the coatings. PMID:12064402

  9. Electron-beam-activated zinc selenide and diamond switches

    NASA Astrophysics Data System (ADS)

    Schoenbach, Karl H.; Kennedy, Mark R.; Joshi, Ravindra P.; Brinkmann, Ralf P.; Ho, Ping-Tong

    1992-05-01

    Zinc Selenide, in polycrystalline and single crystal form, and chemical vapor deposition (CVD) grown diamond films were studied with respect to their application as materials for electron-beam activated switches. The hold-off fields of the three materials were found to exceed that of semi-insulating gallium arsenide by at least an order of magnitude. Highest hold-off fields for pulsed voltage operation were recorded for diamond at 1.8 MV/cm. The electron-beam induced conductance in the 1 mm thick single crystal zinc selenide switches reached values of 0.5 (Ωcm2)-1 with an electron-beam current density of 20 mA/cm2 at electron-energies of 150 keV. This corresponds to an electron-beam induced reduction of switch resistance from 108 Ω to 2 Ω per square centimeter. The dominant carrier loss mechanism in the single crystal zinc selenide switch was found to be direct recombination of electron-hole pairs. In this material, the current, after electron-beam turn-off, decays hyperbolically with 90% to 10% falitimes in the range of hundreds of nanoseconds. The electron-beam induced conductivity in CVD grown diamond films of 1 micrometer thickness is due to the subnanosecond carrier lifetime less than three orders lower than that of single crystal zinc selenide. Both materials, single crystal zinc selenide and diamond, showed a lock-on effect in current. For diamond it could be demonstrated, as before for gaffium arsenide, that this effect can be suppressed by proper choice of contacts.

  10. Electron beam controller. [using magnetic field to refocus spent electron beam in microwave oscillator tube

    NASA Technical Reports Server (NTRS)

    Kosmahl, H. G. (Inventor)

    1973-01-01

    An electron beam device which extracts energy from an electron beam before the electrons of the beam are captured by a collector apparatus is described. The device produces refocusing of a spent electron beam by minimizing tranverse electron velocities in the beam where the electrons, having a multiplicity of axial velocities, are sorted at high efficiency by collector electrodes.

  11. Electron beam selectively seals porous metal filters

    NASA Technical Reports Server (NTRS)

    Snyder, J. A.; Tulisiak, G.

    1968-01-01

    Electron beam welding selectively seals the outer surfaces of porous metal filters and impedances used in fluid flow systems. The outer surface can be sealed by melting a thin outer layer of the porous material with an electron beam so that the melted material fills all surface pores.

  12. Electron beam sterilisation of heterogeneous medical devices

    NASA Astrophysics Data System (ADS)

    Sadat, T.; Morisseau, MrD.; Ross, MissA.

    1993-07-01

    Electron beam radiation is used in the sterilisation of medical disposable devices. High energy, 10 MeV, electron beam linear accelerators are in use worldwide for this purpose. The dose distribution achieved in the products treated influences the efficiency of treatment. This paper looks at the dose distribution achieved with such machines and the methods used to define it in heterogeneous products.

  13. Electron beam effects in a UV FEL

    SciTech Connect

    Wong, R.K.; Blau, J.; Colson, W.B.

    1995-12-31

    At the Continuous Electron Beam Accelerator Facility (CEBAF), a free electron laser (FEL) is designed to produce ultraviolet (UV) light. A four-dimensional FEL simulation studies the effects of betatron oscillations, external focusing, and longitudinal pulse compression of the electron beam on the FEL performance.

  14. Beam rotation and shear in a large electron beam diode

    SciTech Connect

    Mansfield, C.R.; Oona, H.; Shurter, R.P.

    1990-01-01

    The time averaged electron beam current distribution of one of the electron guns of the Large Aperture Module (LAM) of the Aurora laser was measured as part of a larger set of experiments designed to study the electron beam transport to and energy deposition in the LAM laser chamber. The LAM laser chamber has a 1-m {times} 1-m aperture and is pumped from two sides along a 2-m length. A 10 ga. stainless steel sheet was placed inside the laser chamber and served multiple purposes. First, it was used to convert high energy electrons into X-rays in order to make radiograms of the electron beam. Second, the sheet was used as a Faraday cup to measure the total beam current. Third, individual Faraday cups were mounted on the plate to sample the time history of the electron beam at various positions. Each of the LAM electron gun diodes produces a beam of 750 kV electrons with a total current of about 500 kA which is relatively uniform over the cathode area of 1 m {times} 2 m. An applied magnetic field of about 1300 Gauss is used to prevent pinch of the beam during beam transport.

  15. Nanowire growth by an electron beam induced massive phase transformation

    SciTech Connect

    Sood, Shantanu; Kisslinger, Kim; Gouma, Perena

    2014-11-15

    Tungsten trioxide nanowires of a high aspect ratio have been synthesized in-situ in a TEM under an electron beam of current density 14A/cm² due to a massive polymorphic reaction. Sol-gel processed pseudocubic phase nanocrystals of tungsten trioxide were seen to rapidly transform to one dimensional monoclinic phase configurations, and this reaction was independent of the substrate on which the material was deposited. The mechanism of the self-catalyzed polymorphic transition and accompanying radical shape change is a typical characteristic of metastable to stable phase transformations in nanostructured polymorphic metal oxides. A heuristic model is used to confirm the metastable to stable growth mechanism. The findings are important to the control electron beam deposition of nanowires for functional applications starting from colloidal precursors.

  16. Nanowire growth by an electron beam induced massive phase transformation

    DOE PAGESBeta

    Sood, Shantanu; Kisslinger, Kim; Gouma, Perena

    2014-11-15

    Tungsten trioxide nanowires of a high aspect ratio have been synthesized in-situ in a TEM under an electron beam of current density 14A/cm² due to a massive polymorphic reaction. Sol-gel processed pseudocubic phase nanocrystals of tungsten trioxide were seen to rapidly transform to one dimensional monoclinic phase configurations, and this reaction was independent of the substrate on which the material was deposited. The mechanism of the self-catalyzed polymorphic transition and accompanying radical shape change is a typical characteristic of metastable to stable phase transformations in nanostructured polymorphic metal oxides. A heuristic model is used to confirm the metastable to stablemore » growth mechanism. The findings are important to the control electron beam deposition of nanowires for functional applications starting from colloidal precursors.« less

  17. Electron beam curing of polymer matrix composites

    SciTech Connect

    Janke, C.J.; Wheeler, D.; Saunders, C.

    1998-01-08

    The purpose of the CRADA was to conduct research and development activities to better understand and utilize the electron beam PMC curing technology. This technology will be used to replace or supplement existing PMC thermal curing processes in Department of Energy (DOE) Defense Programs (DP) projects and American aircraft and aerospace industries. This effort involved Lockheed Martin Energy Systems, Inc./Lockheed Martin Energy Research Corp. (Contractor), Sandia National Laboratories, and ten industrial Participants including four major aircraft and aerospace companies, three advanced materials companies, and three electron beam processing organizations. The technical objective of the CRADA was to synthesize and/or modify high performance, electron beam curable materials that meet specific end-use application requirements. There were six tasks in this CRADA including: Electron beam materials development; Electron beam database development; Economic analysis; Low-cost Electron Beam tooling development; Electron beam curing systems integration; and Demonstration articles/prototype structures development. The contractor managed, participated and integrated all the tasks, and optimized the project efforts through the coordination, exchange, and dissemination of information to the project participants. Members of the Contractor team were also the principal inventors on several electron beam related patents and a 1997 R and D 100 Award winner on Electron-Beam-Curable Cationic Epoxy Resins. The CRADA achieved a major breakthrough for the composites industry by having successfully developed high-performance electron beam curable cationic epoxy resins for use in composites, adhesives, tooling compounds, potting compounds, syntactic foams, etc. UCB Chemicals, the world`s largest supplier of radiation-curable polymers, has acquired a license to produce and sell these resins worldwide.

  18. Carbon deposition behaviour in metal-infiltrated gadolinia doped ceria electrodes for simulated biogas upgrading in solid oxide electrolysis cells

    NASA Astrophysics Data System (ADS)

    Duboviks, V.; Lomberg, M.; Maher, R. C.; Cohen, L. F.; Brandon, N. P.; Offer, G. J.

    2015-10-01

    One of the attractive applications for reversible Solid Oxide Cells (SOCs) is to convert CO2 into CO via high temperature electrolysis, which is particularly important for biogas upgrading. To improve biogas utility, the CO2 component can be converted into fuel via electrolysis. A significant issue for SOC operation on biogas is carbon-induced catalyst deactivation. Nickel is widely used in SOC electrodes for reasons of cost and performance, but it has a low tolerance to carbon deposition. Two different modes of carbon formation on Ni-based electrodes are proposed in the present work based on ex-situ Raman measurements which are in agreement with previous studies. While copper is known to be resistant towards carbon formation, two significant issues have prevented its application in SOC electrodes - namely its relatively low melting temperature, inhibiting high temperature sintering, and low catalytic activity for hydrogen oxidation. In this study, the electrodes were prepared through a low temperature metal infiltration technique. Since the metal infiltration technique avoids high sintering temperatures, Cu-Ce0.9Gd0.1O2-δ (Cu-CGO) electrodes were fabricated and tested as an alternative to Ni-CGO electrodes. We demonstrate that the performance of Cu-CGO electrodes is equivalent to Ni-CGO electrodes, whilst carbon formation is fully suppressed when operated on biogas mixture.

  19. Low Emittance Electron Beam Studies

    SciTech Connect

    Tikhoplav, Rodion

    2006-04-01

    We have studied the properties of a low emittance electron beam produced by laser pulses incident onto an rf gun photocathode. The experiments were carried out at the A0 photoinjector at Fermilab. Such beam studies are necessary for fixing the design of new Linear Colliders as well as for the development of Free Electron Lasers. An overview of the A0 photoinjector is given in Chapter 1. In Chapter 2 we describe the A0 photoinjector laser system. A stable laser system is imperative for reliable photoinjector operation. After the recent upgrade, we have been able to reach a new level of stability in the pulse-to-pulse fluctuations of the pulse amplitude, and of the temporal and transverse profiles. In Chapter 3 we present a study of transverse emittance versus the shape of the photo-cathode drive-laser pulse. For that purpose a special temporal profile laser shaping device called a pulse-stacker was developed. In Chapter 4 we discuss longitudinal beam dynamics studies using a two macro-particle bunch; this technique is helpful in analyzing pulse compression in the magnetic chicane, as well as velocity bunching effects in the rf-gun and the 9-cell accelerating cavity. In Chapter 5 we introduce a proposal for laser acceleration of electrons. We have developed a laser functioning on the TEM*{sub 01} mode, a mode with a longitudinal electric field component which is suitable for such a process. Using this technique at energies above 40 MeV, one would be able to observe laser-based acceleration.

  20. Comparative Pulmonary Toxicity of Two Ceria Nanoparticles with the Same Primary Size

    PubMed Central

    Peng, Lu; He, Xiao; Zhang, Peng; Zhang, Jing; Li, Yuanyuan; Zhang, Junzhe; Ma, Yuhui; Ding, Yayun; Wu, Zhenqiang; Chai, Zhifang; Zhang, Zhiyong

    2014-01-01

    Ceria nanoparticles (nano-ceria) have recently gained a wide range of applications, which might pose unwanted risks to both the environment and human health. The greatest potential for the environmental discharge of nano-ceria appears to be in their use as a diesel fuel additive. The present study was designed to explore the pulmonary toxicity of nano-ceria in mice after a single exposure via intratracheal instillation. Two types of nano-ceria with the same distribution of a primary size (3–5 nm), but different redox activity, were used: Ceria-p, synthesized by a precipitation route, and Ceria-h, synthesized by a hydrothermal route. Both Ceria-p and Ceria-h induced oxidative stress, inflammatory responses and cytotoxicity in mice, but their toxicological profiles were quite different. The mean size of Ceria-p agglomerates was much smaller compared to Ceria-h, thereby causing a more potent acute inflammation, due to their higher number concentration of agglomerates and higher deposition rate in the deep lung. Ceria-h had a higher reactivity to catalyzing the generation of reactive oxygen species (ROS), and caused two waves of lung injury: bronchoalveolar lavage (BAL) inflammation and cytotoxicity in the early stage and redox-activity-evoked lipid peroxidation and pro-inflammation in the latter stage. Therefore, the size distribution of ceria-containing agglomerates in the exhaust, as well as their surface chemistry are essential characteristics to assess the potential risks of using nano-ceria as a fuel additive. PMID:24727375

  1. Transverse Mode Electron Beam Microwave Generator

    NASA Technical Reports Server (NTRS)

    Wharton, Lawrence E.

    1994-01-01

    An electron beam microwave device having an evacuated interaction chamber to which are coupled a resonant cavity which has an opening between the resonant cavity and the evacuated interaction chamber and an electron gun which causes a narrow beam of electrons to traverse the evacuated interaction chamber. The device also contains a mechanism for feeding back a microwave electromagnetic field from the resonant cavity to the evacuated interaction chamber in such a way as to modulate the direction of propagation of the electron beam, thereby further amplifyjng the microwave electromagnetic field. Furthermore, provision is made for coupling the electromagnetic field out of the electron beam microwave device.

  2. Fundamentals of high energy electron beam generation

    NASA Astrophysics Data System (ADS)

    Turman, B. N.; Mazarakis, M. G.; Neau, E. L.

    High energy electron beam accelerator technology has been developed over the past three decades in response to military and energy-related requirements for weapons simulators, directed-energy weapons, and inertially-confined fusion. These applications required high instantaneous power, large beam energy, high accelerated particle energy, and high current. These accelerators are generally referred to as 'pulsed power' devices, and are typified by accelerating potential of millions of volts (MV), beam current in thousands of amperes (KA), pulse duration of tens to hundreds of nanoseconds, kilojoules of beam energy, and instantaneous power of gigawatts to teffawatts (10(exp 9) to 10(exp 12) watts). Much of the early development work was directed toward single pulse machines, but recent work has extended these pulsed power devices to continuously repetitive applications. These relativistic beams penetrate deeply into materials, with stopping range on the order of a centimeter. Such high instantaneous power deposited in depth offers possibilities for new material fabrication and processing capabilities that can only now be explored. Fundamental techniques of pulse compression, high voltage requirements, beam generation and transport under space-charge-dominated conditions will be discussed in this paper.

  3. Scrap uranium recycling via electron beam melting

    SciTech Connect

    McKoon, R.

    1993-11-01

    A program is underway at the Lawrence Livermore National Laboratory (LLNL) to recycle scrap uranium metal. Currently, much of the material from forging and machining processes is considered radioactive waste and is disposed of by oxidation and encapsulation at significant cost. In the recycling process, uranium and uranium alloys in various forms will be processed by electron beam melting and continuously cast into ingots meeting applicable specifications for virgin material. Existing vacuum processing facilities at LLNL are in compliance with all current federal and state environmental, safety and health regulations for the electron beam melting and vaporization of uranium metal. One of these facilities has been retrofitted with an auxiliary electron beam gun system, water-cooled hearth, crucible and ingot puller to create an electron beam melt furnace. In this furnace, basic process R&D on uranium recycling will be performed with the goal of eventual transfer of this technology to a production facility.

  4. The Electron Beam Ion Source (EBIS)

    ScienceCinema

    Brookhaven Lab

    2010-01-08

    Brookhaven National Lab has successfully developed a new pre-injector system, called the Electron Beam Ion Source, for the Relativistic Heavy Ion Collider (RHIC) and NASA Space Radiation Laboratory science programs. The first of several planned improvemen

  5. Redesigned Electron-Beam Furnace Boosts Productivity

    NASA Technical Reports Server (NTRS)

    Williams, Gary A.

    1995-01-01

    Redesigned electron-beam furnace features carousel of greater capacity so more experiments conducted per loading, and time spent on reloading and vacuum pump-down reduced. Common mounting plate for electron source and carousel simplifies installation and reduces vibration.

  6. The Electron Beam Ion Source (EBIS)

    SciTech Connect

    Brookhaven Lab

    2009-06-09

    Brookhaven National Lab has successfully developed a new pre-injector system, called the Electron Beam Ion Source, for the Relativistic Heavy Ion Collider (RHIC) and NASA Space Radiation Laboratory science programs. The first of several planned improvemen

  7. Technical Seminar: Electron Beam Forming Fabrication

    NASA Video Gallery

    EBF³ uses a focused electron beam in a vacuum environment to create a molten pool on a metallic substrate. This layer-additive process enables fabrication of parts directly from CAD drawings. The ...

  8. Stabilization of electron beam spot size by self bias potential

    SciTech Connect

    Kwan, T.J.T.; Moir, D.C.; Snell, C.M.; Kang, M.

    1998-12-31

    In high resolution flash x-ray imaging technology the electric field developed between the electron beam and the converter target is large enough to draw ions from the target surface. The ions provide fractional neutralization and cause the electron beam to focus radially inward, and the focal point subsequently moves upstream due to the expansion of the ion column. A self-bias target concept is proposed and verified via computer simulation that the electron charge deposited on the target can generate an electric potential, which can effectively limit the ion motion and thereby stabilize the growth of the spot size. A target chamber using the self bias target concept was designed and tested in the Integrated Test Stand (ITS). The authors have obtained good agreement between computer simulation and experiment.

  9. Survey on electron beam processing technologies

    NASA Astrophysics Data System (ADS)

    Yasui, S.; Sunabe, K.; Inaba, T.

    1990-06-01

    The developing situation is studied of electron beam processing technologies and the future problems are shown when these are utilized for electric power utilities. When an electron beam is used as a heating source by focussing, the electron beam has features of high focusability, high controllability and high energy density, so that the electron beam is used for parts requiring high quality processing from micro machining, case hardening, and welding to melting furnaces of metals of high melting point. Presently is necessary to hold ultra high voltage for acceleration and high vacuum because of lower current. Since the processing capability with high energy density is high and the energy consumption efficiency is also high for the chemical field using the high energy density of the electron beam, the application are researched in the field from sterilization of medical instruments, sterilization of sludge, through food processing, improvement of thermal resistance of insulated wires to flue gas irradiation to desulfurize and denitrify. But a practical use is not yet realized because of small current of electron beam. Therefore, the largest technological problem may be the development of high current electron gun and the beam control systems.

  10. Plasma lenses for focusing relativistic electron beams

    SciTech Connect

    Govil, R.; Wheeler, S.; Leemans, W.

    1997-04-01

    The next generation of colliders require tightly focused beams with high luminosity. To focus charged particle beams for such applications, a plasma focusing scheme has been proposed. Plasma lenses can be overdense (plasma density, n{sub p} much greater than electron beam density, n{sub b}) or underdense (n{sub p} less than 2 n{sub b}). In overdense lenses the space-charge force of the electron beam is canceled by the plasma and the remaining magnetic force causes the electron beam to self-pinch. The focusing gradient is nonlinear, resulting in spherical aberrations. In underdense lenses, the self-forces of the electron beam cancel, allowing the plasma ions to focus the beam. Although for a given beam density, a uniform underdense lens produces smaller focusing gradients than an overdense lens, it produces better beam quality since the focusing is done by plasma ions. The underdense lens can be improved by tapering the density of the plasma for optimal focusing. The underdense lens performance can be enhanced further by producing adiabatic plasma lenses to avoid the Oide limit on spot size due to synchrotron radiation by the electron beam. The plasma lens experiment at the Beam Test Facility (BTF) is designed to study the properties of plasma lenses in both overdense and underdense regimes. In particular, important issues such as electron beam matching, time response of the lens, lens aberrations and shot-to-shot reproducibility are being investigated.

  11. Improved performance of ceria-based solid oxide fuel cell using doped LaGaO3 films deposited by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Qian, Jing; Zhu, Zhiwen; Jiang, Guoshun; Liu, Wei

    2014-01-01

    A dense La0.9Sr0.1Ga0.8Mg0.2O3-δ (LSGM) film is fabricated using the pulsed laser deposition (PLD) technique on a Ce0.8Sm0.2O2-δ (SDC) electrolyte which is prepared using a co-pressing process on a NiO-SDC anode substrate. The LSGM/SDC bilayer electrolyte cell with Sm0.5Sr0.5CoO3-δ-Ce0.8Sm0.2O2-δ (SSC-SDC, 70:30 wt.%) cathode achieves significantly enhanced cell performance, yielding open circuit voltage (OCV) value of 0.89 V and maximum power density of 758 mW cm-2 at 700 °C. The electrical current leakage in the SDC single layer cell caused by the reduction of Ce4+ to Ce3+ in reducing environment has been eliminated by depositing the LSGM thin film as a blocking layer; besides, the reaction between NiO and LSGM can be prevented due to the dense SDC electrolyte layer. The influence of oxygen pressure and post-annealing temperature on the crystallinity, microstructure and surface roughness of the LSGM films are studied for obtaining a high quality film. Characterization analysis of the cell shows that the bilayer electrolyte deposited by the PLD technique have retained the chemical, mechanical and structural integrity of the cell.

  12. Electrical, Electrochemical, and Optical Characterization of Ceria Films

    NASA Astrophysics Data System (ADS)

    Oh, Tae-Sik

    Acceptor-doped ceria has been recognized as a promising intermediate temperature solid oxide fuel cell electrode/electrolyte material. For practical implementation of ceria as a fuel cell electrolyte and for designing model experiments for electrochemical activity, it is necessary to fabricate thin films of ceria. Here, metal-organic chemical vapor deposition was carried out in a homemade reactor to grow ceria films for further electrical, electrochemical, and optical characterization. Doped/undoped ceria films are grown on single crystalline oxide wafers with/without Pt line pattern or Pt solid layer. Deposition conditions were varied to see the effect on the resultant film property. Recently, proton conduction in nanograined polycrystalline pellets of ceria drew much interest. Thickness-mode (through-plane, z-direction) electrical measurements were made to confirm the existence of proton conductivity and investigate the nature of the conduction pathway: exposed grain surfaces and parallel grain boundaries. Columnar structure presumably favors proton conduction, and we have found measurable proton conductivity enhancement. Electrochemical property of gas-columnar ceria interface on the hydrogen electrooxidation is studied by AC impedance spectroscopy. Isothermal gas composition dependence of the electrode resistance was studied to elucidate Sm doping level effect and microstructure effect. Significantly, preferred orientation is shown to affect the gas dependence and performance of the fuel cell anode. A hypothesis is proposed to explain the origin of this behavior. Lastly, an optical transmittance based methodology was developed to obtain reference refractive index and microstructural parameters (thickness, roughness, porosity) of ceria films via subsequent fitting procedure.

  13. Non-Vacuum Electron Beam Welding

    SciTech Connect

    Hershcovitch, Ady

    2007-01-31

    Original objectives of CRADA number BNL-01-03 between BNL and Acceleron, Inc., were to further develop the Plasma Window concept (a BNL invention covered by US Patent number 5,578,831), mate the Plasma Window to an existing electron beam welder to perform in-air electron beam welding, and mount the novel nonvacuum electron beam welder on a robot arm. Except for the last objective, all other goals were met or exceeded. Plasma Window design and operation was enhanced during the project, and it was successfully mated to a conventional4 kW electron beam welder. Unprecedented high quality non-vacuum electron beam . welding was demonstrated. Additionally, a new invention the Plasma Shield (US Patent number 7,075,030) that chemically and thermally shields a target object was set forth. Great interest in the new technology was shown by a number of industries and three arcs were sold for experimental use. However, the welding industry requested demonstration of high speed welding, which requires 100 kW electron beam welders. The cost of such a welder involved the need for additional funding. Therefore, some of the effort was directed towards Plasma Shield development. Although relatively a small portion of the R&D effort was spent on the Plasma Shield, some very encouraging results were obtained. Inair Plasma Shield was demonstrated. With only a partial shield, enhanced vacuum separation and cleaner welds were realized. And, electron beam propagation in atmosphere improved by a factor of about 3. Benefits to industry are the introduction of two new technologies. BNL benefited from licensing fee cash, from partial payment for employee salary, and from a new patent In addition to financial benefits, a new technology for physics studies was developed. Recommendations for future work are to develop an under-water plasma shield, perform welding with high-power electron beam:s, carry out other plasma shielded electron beam and laser processes. Potential benefits from further R

  14. 650 mm long liquid hydrogen target for use in a high intensity electron beam

    SciTech Connect

    Mark, J.W.

    1984-02-01

    This paper describes a 650 mm long liquid hydrogen targetr constructed for use in the high intensity electron beam at the Stanford Linear Accelerator Center (SLAC). The main design problem was to construct a target that would permit the heat deposited by the electron beam to be removed rapidly without boiling the hydrogen so as to maintain constant target density for optimum data taking. Design requirements, cosntruction details and operating experience are discussed.

  15. Portable Electron-Beam Free-Form Fabrication System

    NASA Technical Reports Server (NTRS)

    Watson, J. Kevin; Petersen, Daniel D.; Taminger, Karen M.; Hafley, Robert A.

    2005-01-01

    when not under vacuum. During operation, wire will be fed to a fixed location, entering the melted pool created by the electron beam. Heated by the electron beam, the wire will melt and fuse to either the substrate or with the previously deposited metal wire fused on top of the positioning table. Based on a computer aided design (CAD) model and controlled by a computer, the positioning subsystem

  16. Patient radiation doses for electron beam CT

    SciTech Connect

    Castellano, Isabel A.; Dance, David R.; Skinner, Claire L.; Evans, Phil M.

    2005-08-15

    A Monte Carlo based computer model has been developed for electron beam computed tomography (EBCT) to calculate organ and effective doses in a humanoid hermaphrodite phantom. The program has been validated by comparison with experimental measurements of the CT dose index in standard head and body CT dose phantoms; agreement to better than 8% has been found. The robustness of the model has been established by varying the input parameters. The amount of energy deposited at the 12:00 position of the standard body CT dose phantom is most susceptible to rotation angle, whereas that in the central region is strongly influenced by the beam quality. The program has been used to investigate the changes in organ absorbed doses arising from partial and full rotation about supine and prone subjects. Superficial organs experience the largest changes in absorbed dose with a change in subject orientation and for partial rotation. Effective doses for typical clinical scan protocols have been calculated and compared with values obtained using existing dosimetry techniques based on full rotation. Calculations which make use of Monte Carlo conversion factors for the scanner that best matches the EBCT dosimetric characteristics consistently overestimate the effective dose in supine subjects by typically 20%, and underestimate the effective dose in prone subjects by typically 13%. These factors can therefore be used to correct values obtained in this way. Empirical dosimetric techniques based on the dose-length product yield errors as great as 77%. This is due to the sensitivity of the dose length product to individual scan lengths. The magnitude of these errors is reduced if empirical dosimetric techniques based on the average absorbed dose in the irradiated volume (CTDI{sub vol}) are used. Therefore conversion factors specific to EBCT have been calculated to convert the CTDI{sub vol} to an effective dose.

  17. Plasma-wall interaction in an electrostatic sheath of plasma containing a monoenergetic electron beam

    NASA Astrophysics Data System (ADS)

    Ou, Jing; Zhao, Xiaoyun; Gan, Chunyun

    2016-04-01

    The plasma-wall interaction in the presence of a monoenergetic electron beam has been studied by taking into account the self-consistency among plasma transport in a collisionless electrostatic sheath, deposited energy flux at the wall and material thermal response for carbon and tungsten as wall materials. The variations of the potential drop across the sheath, ion velocity at the sheath edge, and surface temperature of material as a function of electron beam flux are explored in the presence of the electron emission. It is found that when electron beam does not dominate the sheath, potential drop across the sheath depends strongly on the material properties due to the impact of electron emission while the surface temperature of material shows monotonic variation. In the case of carbon wall, the electron beam may dominate the sheath at a certain electron beam concentration or energy. Under this circumstance, both the potential drop across the sheath and surface temperature of material demonstrate the sharp increasing transition. The development of local hot spot on the plasma facing material is caused by the enhanced ion energy flux instead of the electron beam energy flux. If the electron emission is not taken into account, as a smaller electron beam flux, both the potential drop across the sheath and surface temperature of material display the significant change and then it may be easier to develop for the local hot spot on the plasma facing material.

  18. Device and method for electron beam heating of a high density plasma

    DOEpatents

    Thode, Lester E.

    1981-01-01

    A device and method for relativistic electron beam heating of a high density plasma in a small localized region. A relativistic electron beam generator produces a high voltage electron beam which propagates along a vacuum drift tube and is modulated to initiate electron bunching within the beam. The beam is then directed through a low density gas chamber which provides isolation between the vacuum modulator and the relativistic electron beam target. The relativistic beam is then applied to a high density target plasma which typically comprises DT, DD, hydrogen boron or similar thermonuclear gas at a density of 10.sup.17 to 10.sup.20 electrons per cubic centimeter. The target plasma is ionized prior to application of the electron beam by means of a laser or other preionization source. Utilizing a relativistic electron beam with an individual particle energy exceeding 3 MeV, classical scattering by relativistic electrons passing through isolation foils is negligible. As a result, relativistic streaming instabilities are initiated within the high density target plasma causing the relativistic electron beam to efficiently deposit its energy into a small localized region within the high density plasma target.

  19. Artificial auroras in the upper atmosphere. 1. Electron beam injections

    SciTech Connect

    Burch, J.L.; Gibson, W.C.; Marshall, J.A. ); Mende, S.B.; Swenson, G.R. ); Kawashima, N. ); Roberts, W.T. ); Taylor, W.W.L. ); Neubert, T. )

    1993-03-19

    Artificial electron beams from the Space Experiments with Particle Accelerators (SEPAC) on the ATLAS 1 Spacelab payload were used to stimulate auroral emissions at southern auroral latitudes. The emitted electron beams were monoenergetic at 6.25 keV and were fired in one-second pulses every fifteen seconds with currents of 1.21 A. Optical measurements of the beam were made in the vicinity of the Shuttle Orbiter by its on-board television camera and in the upper atmosphere by the Atmospheric Emissions Photometric Imager (AEPI). AEPI imaged auroral emissions in both white light and at the 427.8 nm N[sub 2][sup +] emission line. Energy deposition calculations and the results of previous sounding-rocket experiments had suggested that emissions with scale sizes of about 130 meters would result from the artificial electron beams with the visible emissions extending from about 110 to 130 km altitudes. In the ATLAS 1 experiments the auroral imaging was performed from the Shuttle, providing a new perspective on the artificial auroras and allowing the emissions to be traced from altitudes near the 295 km Shuttle altitude down to the 110 km level along the curved magnetic field lines. 11 refs., 3 figs., 1 tab.

  20. Plasma heating with crossing relativistic electron beams

    NASA Astrophysics Data System (ADS)

    Ratan, Naren; Sircombe, Nathan; Ceurvorst, Luke; Kasim, Muhammad; Sadler, James; Bingham, Robert; Trines, Raoul; Norreys, Peter

    2015-11-01

    Plasma heating by relativistic electron beams is a powerful tool with applications including the heating of inertial confinement fusion targets and the study of matter in extreme conditions. We discuss the use of two relativistic electron beams to efficiently heat the plasma ions where the beams cross by using beam-plasma instabilities and non-linear wave coupling between Langmuir and ion-acoustic waves. Energy from the electron beams is coupled to the plasma ions as the beams become unstable and drive Langmuir waves which couple non-linearly to ion-acoustic waves which are then damped . Results of linear growth rate calculations are presented for the system of two crossing electron beams demonstrating a broad spectrum of unstable modes. Relativistic Vlasov-Maxwell simulations in two space and two momentum dimensions have been performed which demonstrate the non-linear coupling of the electron beam energy into ion-acoustic waves and the energy cascade to the background ions. Time-frequency analysis is applied to analyze the non-linear coupling between Langmuir and ion-acoustic waves in wave phase space. Structural properties of the strong turbulence produced at late times are analyzed.

  1. Modelling of electron beam induced nanowire attraction

    NASA Astrophysics Data System (ADS)

    Bitzer, Lucas A.; Speich, Claudia; Schäfer, David; Erni, Daniel; Prost, Werner; Tegude, Franz J.; Benson, Niels; Schmechel, Roland

    2016-04-01

    Scanning electron microscope (SEM) induced nanowire (NW) attraction or bundling is a well known effect, which is mainly ascribed to structural or material dependent properties. However, there have also been recent reports of electron beam induced nanowire bending by SEM imaging, which is not fully explained by the current models, especially when considering the electro-dynamic interaction between NWs. In this article, we contribute to the understanding of this phenomenon, by introducing an electro-dynamic model based on capacitor and Lorentz force interaction, where the active NW bending is stimulated by an electromagnetic force between individual wires. The model includes geometrical, electrical, and mechanical NW parameters, as well as the influence of the electron beam source parameters and is validated using in-situ observations of electron beam induced GaAs nanowire (NW) bending by SEM imaging.

  2. Evidence of locally enhanced target heating due to instabilities of counter-streaming fast electron beams

    SciTech Connect

    Koester, Petra; Cecchetti, Carlo A.; Booth, Nicola; Woolsey, Nigel; Chen, Hui; Evans, Roger G.; Gregori, Gianluca; Li, Bin; Mithen, James; Murphy, Christopher D.; Labate, Luca; Gizzi, Leonida A.; Levato, Tadzio; Makita, Mikako; Riley, David; Notley, Margaret; Pattathil, Rajeev

    2015-02-15

    The high-current fast electron beams generated in high-intensity laser-solid interactions require the onset of a balancing return current in order to propagate in the target material. Such a system of counter-streaming electron currents is unstable to a variety of instabilities such as the current-filamentation instability and the two-stream instability. An experimental study aimed at investigating the role of instabilities in a system of symmetrical counter-propagating fast electron beams is presented here for the first time. The fast electron beams are generated by double-sided laser-irradiation of a layered target foil at laser intensities above 10{sup 19 }W/cm{sup 2}. High-resolution X-ray spectroscopy of the emission from the central Ti layer shows that locally enhanced energy deposition is indeed achieved in the case of counter-propagating fast electron beams.

  3. REVIEW: Review of electron beam therapy physics

    NASA Astrophysics Data System (ADS)

    Hogstrom, Kenneth R.; Almond, Peter R.

    2006-07-01

    For over 50 years, electron beams have been an important modality for providing an accurate dose of radiation to superficial cancers and disease and for limiting the dose to underlying normal tissues and structures. This review looks at many of the important contributions of physics and dosimetry to the development and utilization of electron beam therapy, including electron treatment machines, dose specification and calibration, dose measurement, electron transport calculations, treatment and treatment-planning tools, and clinical utilization, including special procedures. Also, future changes in the practice of electron therapy resulting from challenges to its utilization and from potential future technology are discussed.

  4. Control and Manipulation of Electron Beams

    SciTech Connect

    Piot, Philippe

    2009-01-22

    The concepts of the advanced accelerators and light source rely on the production of bright electron beams. The rms areas of the beam phase space often need to be tailored to the specific applications. Furthermore, a new class of the forefront research calls for detailed specific distribution such as the particle density in the time coordinate. Several groups are tackling these various challenges and in this report we attempt to give a review of the state-of-the-art of the control and manipulation of the electron beams.

  5. A conceptual design for an electron beam

    SciTech Connect

    Garcia, M

    1999-02-15

    This report is a brief description of a model electron beam, which is meant to serve as a pulsed heat source that vaporizes a metal fleck into an ''under-dense'' cloud. See Reference 1. The envelope of the electron beam is calculated from the paraxial ray equation, as stated in Reference 2. The examples shown here are for 5 A, 200 keV beams that focus to waists of under 0.4 mm diameter, within a cylindrical volume of 10 cm radius and length. The magnetic fields assumed in the examples are moderate, 0.11 T and 0.35 T, and can probably be created by permanent magnets.

  6. Control and manipulation of electron beams

    SciTech Connect

    Piot, Philippe; /NICADD, DeKalb /Northern Illinois U. /Fermilab

    2008-09-01

    The concepts of the advanced accelerators and light source rely on the production of bright electron beams. The rms areas of the beam phase space often need to be tailored to the specific applications. Furthermore, a new class of the forefront research calls for detailed specific distribution such as the particle density in the time coordinate. Several groups are tackling these various challenges and in this report we attempt to give a review of the state-of-the-art of the control and manipulation of the electron beams.

  7. Green coffee decontamination by electron beam irradiation

    NASA Astrophysics Data System (ADS)

    Nemtanu, Monica R.; Brasoveanu, Mirela; Grecu, Maria Nicoleta; Minea, R.

    2005-10-01

    Microbiological load of green coffee is a real problem considering that it is extremely sensitive to contamination. Irradiation is a decontamination method for a lot of foodstuffs, being a feasible, very effective and environment friendly one. Beans and ground green coffee were irradiated with electron beams up to 40 kGy. Microbial load, rheological behavior, electron paramagnetic resonance (EPR) and visible spectroscopy were carried out. The results show that electron beam irradiation of green coffee could decontaminate it without severe changes in its properties.

  8. Control of Space-Based Electron Beam Free Form Fabrication

    NASA Technical Reports Server (NTRS)

    Seifzer. W. J.; Taminger, K. M.

    2007-01-01

    Engineering a closed-loop control system for an electron beam welder for space-based additive manufacturing is challenging. For earth and space based applications, components must work in a vacuum and optical components become occluded with metal vapor deposition. For extraterrestrial applications added components increase launch weight, increase complexity, and increase space flight certification efforts. Here we present a software tool that closely couples path planning and E-beam parameter controls into the build process to increase flexibility. In an environment where data collection hinders real-time control, another approach is considered that will still yield a high quality build.

  9. Emission of an intense electron beam from a ceramic honeycomb

    NASA Astrophysics Data System (ADS)

    Friedman, M.; Myers, M.; Hegeler, F.; Swanekamp, S. B.; Sethian, J. D.; Ludeking, L.

    2003-01-01

    Inserting a slab of honeycomb ceramic in front of the emitting surface of a large-area cathode improves the electron beam emission uniformity, decreases the beam current rise and fall times, and maintains a more constant diode impedance. Moreover, changing the cathode material from velvet to carbon fiber achieved a more robust cathode that starts to emit at a higher electric field without a degradation in beam uniformity. In addition, an 80% reduction in the postshot diode pressure was also observed when gamma alumina was deposited on the ceramic. A possible explanation is that reabsorption and recycling of adsorbed gases takes place.

  10. Electron beam puts a shine on leather

    SciTech Connect

    Berberich, S.

    1986-02-01

    A technique for curing leather using either ultraviolet or electron-beam radiation has been developed. This type of radiation curing saves at least 60 percent of the energy cost of conventional leather finishing and can also result in considerable savings in plant space and labor. The implications of the new technology in international balance of trade are discussed.

  11. Electron beam ion sources and traps (invited)

    NASA Astrophysics Data System (ADS)

    Becker, Reinard

    2000-02-01

    The electron beam method of stepwise ionization to highest charge states has found applications in electron beam ion sources (EBISs) for accelerators and atomic physics collision experiments as well as in electron beam ion traps (EBITs) for x-ray and mass spectroscopy. A dense and almost monoenergetic electron beam provides a unique tool for ionization, because radiative recombination by slow electrons is negligible and charge exchange is almost avoided in ultrahigh vacua. These are essential differences to electron cyclotron resonance ion sources with inevitable low energy electrons and comparatively high gas pressure. The distinction between EBIS and EBIT as genuine devices has become meaningless, because EBISs may work as traps and almost all EBITs are feeding beamlines for external experiments. More interesting is to note the diversification of these devices, which demonstrates that a matured technology is finding dedicated answers for different applications. At present we may distinguish six major lines of development and application: high current EBISs for upcoming hadron colliders, super EBITs in the energy range above 300 keV for quantum electrondynamics tests, inexpensive and small EBISTs for atomic physics studies, a highly efficient EBIS with oscillating electrons, MEDEBIS for tumor therapy with C6+, and charge breeding in facilities for exotic radioactive beams.

  12. Theory of helical electron beams in gyrotrons

    SciTech Connect

    Kuftin, A.N.; Lygin, V.K.; Manuilov, V.N.; Raisky, B.V.; Solujanova, E.A.; Tsimring, S.E.

    1993-04-01

    Helical electron beams (HEB) with disturbed axial symmetry of currents density and HEB with locking electrons in magnetic trap are described. The theory of magnetron injection gun (MIG) in space-charge limited current is developed. Systems on permanent magnets forming HEB are considered. 30 refs., 12 figs., 5 tabs.

  13. Parameterization of electron beam output factor.

    PubMed

    Akino, Yuichi; Zhu, Timothy C; Das, Indra J

    2015-06-01

    Electron beam dose distribution is dependent on the beam energy and complicated trajectory of particles. Recent treatment planning systems using Monte Carlo calculation algorithm provide accurate dose calculation. However, double check of monitor units (MUs) based on an independent algorithm is still required. In this study, we have demonstrated single equation that reproduces the measured relative output factor (ROF) that can be used for MU calculation for electron radiotherapy. Electron beams generated by an iX (Varian Medical Systems) and a PRIMUS (Siemens) accelerator were investigated. For various energies of electron beams, the ROF at respective dmax were measured using diode detector in a water phantom at SSD of 100 cm. Curve fitting was performed with an exponential generalized equation ROF = α(β - e(-γR)) including three variables (α, β, γ) as a function of field radius and electron energy. The correlation coefficients between the ROF measured and that calculated by the equation were greater than 0.998. For ROF of Varian electron beams, the average values of all fitting formulas were applied for two of the constants; α and β. The parameter γ showed good agreement with the quadratic approximation as a function of mean energy at surface (E0). The differences between measured and calculated ROF values were within ± 3% for beams with cutout radius of ≥ 1.5 cm for electron beams with energies from 6 MeV to 15 MeV. The proposed formula will be helpful for double-check of MUs, as it requires minimal efforts for MU calculation. PMID:25726475

  14. A reflex electron beam discharge as a plasma source for electron beam generation

    SciTech Connect

    Murray, C.S.; Rocca, J.J.; Szapiro, B. )

    1988-10-01

    A reflex electron beam glow discharge has been used as a plasma source for the generation of broad-area electron beams. An electron current of 120 A (12 A/cm/sup 2/) was extracted from the plasma in 10 ..mu..s pulses and accelerated to energies greater than 1 keV in the gap between two grids. The scaling of the scheme for the generation of multikiloamp high-energy beams is discussed.

  15. Electron beam induced conductivity effect of polymer resists and charging induced electron beam deflection simulation in electron beam lithography

    NASA Astrophysics Data System (ADS)

    Hwu, Justin Jia-Jen

    2000-10-01

    The electron beam induced conductivity (EBIC) effect of polymer materials was investigated and three electron beam resists, PBS, EBR900, and ZEP7000, were used as target materials in this research. An external bias method was applied for the direct measurements of EBIC current and the EBIC conductivity was then derived. The temperature effect on EBIC was illustrated by EBR900 and a simple single trap level analysis gave good agreement in explanation of initial state conductivity dependence on temperature change. The dependence of initial state EBIC values on dose rates and bias was also determined and an empirical from of EBIC-bias relationship was established for the electron beam deflection modeling. The long term EBIC characteristics of resists were investigated under different dose rates. The variation of EBIC versus time was explained by a transient theory that considers rates of carrier generation, carrier trapping, carrier detrapping, and carrier recombination contribution. The trapping model analysis on steady state EBIC results revealed that PBS has a uniform distribution of traps, while EBR900 and ZEP7000 fall in the same category that has exponential distribution of traps. The steady state EBIC gain was also determined for the three resists and the onset of the plasma region was observed for EBR900 and ZEP7000. A simulation model for the calculation of electron beam deflection owing to resist charging was developed in the second part of this research. Charging patterns of circles and squares of different dimensions were considered. Both SIMION and MATHEMATICA were used as simulation tools and the limitation of SIMION was illustrated and discussed. The model programmed in MATHEMATICA simulated electron beam deflection during e-beam writing. With the combination of the empirical EBIC-bias relationship of EBR900, the model simulated surface potential decay after irradiation and the results showed good agreement with literature values. The extent of

  16. Electron Beam Scanning in Industrial Applications

    NASA Astrophysics Data System (ADS)

    Jongen, Yves; Herer, Arnold

    1996-05-01

    Scanned electron beams are used within many industries for applications such as sterilization of medical disposables, crosslinking of wire and cables insulating jackets, polymerization and degradation of resins and biomaterials, modification of semiconductors, coloration of gemstones and glasses, removal of oxides from coal plant flue gasses, and the curing of advanced composites and other molded forms. X-rays generated from scanned electron beams make yet other applications, such as food irradiation, viable. Typical accelerators for these applications range in beam energy from 0.5MeV to 10 MeV, with beam powers between 5 to 500kW and scanning widths between 20 and 300 cm. Since precise control of dose delivery is required in many of these applications, the integration of beam characteristics, product conveyance, and beam scanning mechanisms must be well understood and optimized. Fundamental issues and some case examples are presented.

  17. Electron beam driven disordering in small particles

    SciTech Connect

    Vanfleet, R.R.; Mochel, J.

    1997-11-01

    Small metal particles in the range of a few nanometers in diameter are seen to progressively disorder when the 100 keV electron beam of a Scanning Transmission Electron Microscope (STEM) is held stationary on the particle. The diffraction pattern of the individual particle is seen to progress from an initial array of indexable diffraction spots to a mixture of diffraction spots and amorphous-like rings and finally to rings with no persistent diffraction spots. After the electron beam is removed, the particles will recrystallize after minutes or hours. Only particles below a critical size are seen to fully disorder. The authors have observed this in platinum, palladium, rhodium, and iridium and based on the model of disordering process believe it is a universal effect. It has also been observed with a platinum ruthenium alloy. They discuss the mechanism of this disordering and the structure of the resulting disordering particle for the case of platinum clusters.

  18. Electron beam facility for divertor target experiments

    SciTech Connect

    Anisimov, A.; Gagen-Torn, V.; Giniyatulin, R.N.

    1994-12-31

    To test different concepts of divertor targets and bumpers an electron beam facility was assembled in Efremov Institute. It consists of a vacuum chamber (3m{sup 3}), vacuum pump, electron beam gun, manipulator to place and remove the samples, water loop and liquid metal loop. The following diagnostics of mock-ups is stipulated: (1) temperature distribution on the mock-up working surface (scanning pyrometer and infra-red imager); (2) temperature distribution over mocked-up thickness in 3 typical cross-sections (thermo-couples); (3) cracking dynamics during thermal cycling (acoustic-emission method), (4) defects in the mock-up before and after tests (ultra-sonic diagnostics, electron and optical microscopes). Carbon-based and beryllium mock-ups are made for experimental feasibility study of water and liquid-metal-cooled divertor/bumper concepts.

  19. Ion acceleration mechanism in electron beams

    SciTech Connect

    Popov, A.F.

    1982-07-01

    Analysis of experimental data reveals that several processes observed in diodes and during the transport of intense electron beams in a neutral gas result from polarization of a plasma in an electric field. Under certain conditions this effect gives rise to a high-field region at the boundary of a plasma column. The electron beam is strongly focused in this region. As a result, a two-dimensional potential well forms at the crossover point of a strongly focused beam. The electric field at this well can reach several megavolts per centimeter. The crossover point moves as a result of expansion of the plasma cloud. The ions trapped in the potential well are accelerated. There is effective acceleration over a distance of the order of a few times the beam radius. A new physical model gives a satisfactory explanation of the experimental results.

  20. ELECTRON BEAM THERAPY OF MYCOSIS FUNGOIDES

    PubMed Central

    Bagshaw, Malcolm A.; Schneidman, Harold M.; Farber, Eugene M.; Kaplan, Henry S.

    1961-01-01

    Ionizing radiation in the form of x-ray therapy is the best modality of treatment available at the present time for single, isolated lesions of mycosis fungoides. However, for generalized mycosis fungoides, generalized x-ray therapy is technically difficult and dangerous. It is now possible to employ electron beam therapy for generalized mycosis fungoides, using energies which confine the dose to the superficial layers of the skin and thus avoid hematopoietic injury. A technique for wide field electron beam therapy has been developed for this purpose which has been effective and well tolerated in limited trials to date. ImagesFigure 2.Figure 4.Figure 4.Figure 4.Figure 5.Figure 5.Figure 5.Figure 6. AFigure 6. A PMID:13863947

  1. Characterization Of A Wakefield Accelerated Electron Beam

    NASA Astrophysics Data System (ADS)

    Guèye, Paul; Keppel, Cynthia; Lane, Bianca; Owens, Judy; Torrence, Rickey; Saleh, Ned; Umstadter, Don; Zhang, Ping; Ent, Rolf; Assamagan, Kétévi

    2001-10-01

    With the advancement of femtosecond Terawatt lasers, there has been great interest in their ability of accelerating electrons to high energy within short distances; this effect originating from the GeV/cm gradient created in the plasma (compared to conventional RF systems). We report on new experimental results obtained from a 400 fs/4 J-laser plasma driven electron beam. The data were collected by means of a ~ 3 m QQ¯QD spectrometer especially designed for that experiment. A 32× 16 fiber array detector, along with a scintillating LANEX screen and a Faraday cup were used to detect the electrons, and for charge monitoring. The momentum and spatial distributions of the beam were reconstructed. The results are consistent with a previous experiment, and compatible with a GEANT simulation used for background estimation due primarily to secondaries induced by electron-beam pipe collisions. We also report on the extracted emittance of the beam for the corresponding momentum range.

  2. Proposed LLNL electron beam ion trap

    SciTech Connect

    Marrs, R.E.; Egan, P.O.; Proctor, I.; Levine, M.A.; Hansen, L.; Kajiyama, Y.; Wolgast, R.

    1985-07-02

    The interaction of energetic electrons with highly charged ions is of great importance to several research fields such as astrophysics, laser fusion and magnetic fusion. In spite of this importance there are almost no measurements of electron interaction cross sections for ions more than a few times ionized. To address this problem an electron beam ion trap (EBIT) is being developed at LLNL. The device is essentially an EBIS except that it is not intended as a source of extracted ions. Instead the (variable energy) electron beam interacting with the confined ions will be used to obtain measurements of ionization cross sections, dielectronic recombination cross sections, radiative recombination cross sections, energy levels and oscillator strengths. Charge-exchange recombinaion cross sections with neutral gasses could also be measured. The goal is to produce and study elements in many different charge states up to He-like xenon and Ne-like uranium. 5 refs., 2 figs.

  3. Ablation of Metals for Materials Processing via a Channelspark Electron Beam

    NASA Astrophysics Data System (ADS)

    Kovaleski, S. D.; Gilgenbach, R. M.; Rintamaki, J. I.; Ang, L. K.; Spindler, H. L.; Cohen, W. E.; Lau, Y. Y.; Lash, J. S.

    1996-11-01

    Channelspark driven ablation experiments have been designed to characterize ablated species of materials suitable for thin film deposition. The channelspark is a pseudospark device, developed by KFK footnote G. Muller, C. Schultheiss, Proc. of Beams, 2, 833(1994), capable of producing high current, low energy electron beams. The source operates with a 15-20kV accelerating potential and measured e-beam source current less than 2000A. Beam transport through the 5 to 20 mTorr argon background gas has been investigated. Al, Fe, and Ti ablation is being studied through spectroscopy and beam current techniques. Electron beam induced target damage is being compared to laser beam damaged targets. Electron transport and energy deposition in metals are being simulated in the ITS-TIGER code (Sandia Report No. SAND 91-1634) developed at Sandia National Laboratory. The thermodynamics of electron beam ablation of metals is compared to lasers.

  4. Preventing Contamination In Electron-Beam Welds

    NASA Technical Reports Server (NTRS)

    Goodin, Wesley D.; Gulbrandsen, Kevin A.; Oleksiak, Carl

    1990-01-01

    Simple expedient eliminates time-consuming, expensive manual hand grinding. Use of groove and backup tube greatly reduces postweld cleanup in some electron-beam welding operations. Tube-backup method developed for titanium parts, configurations of which prevents use of solid-block backup. In new welding configuration, tube inserted in groove to prevent contact between alumina beads and molten weld root. When welding complete and beads and tube removed, only minor spatter remains and is ground away easily.

  5. Separating Isotopes With Laser And Electron Beams

    NASA Technical Reports Server (NTRS)

    Trajmar, Sandor

    1989-01-01

    Need for second laser eliminated. In scheme for separation of isotopes, electrons of suitable kinetic energy ionize specific isotope excited by laser beam in magnetic field. Ionization by electron beams cheap and efficient in comparison to ionization by laser beams, and requires no special technical developments. Feasibility of new scheme demonstrated in selective ionization of Ba138, making possible separation of isotope from Ba isotopes of atomic weight 130, 132, 134, 135, 136, and 137.

  6. Fundamental edge broadening effects during focused electron beam induced nanosynthesis

    DOE PAGESBeta

    Schmied, Roland; Fowlkes, Jason Davidson; Winkler, Robert; Rack, Phillip D.; Plank, Harald

    2015-02-16

    In this study, we explore lateral broadening effects of 3D structures fabricated through focused electron beam induced deposition using MeCpPt(IV)Me3 precursor. In particular, the scaling behavior of proximity effects as a function of the primary electron energy and the deposit height is investigated through experiments and validated through simulations. Correlated Kelvin force microscopy and conductive atomic force microscopy measurements identified conductive and non-conductive proximity regions. It was determined that the highest primary electron energies enable the highest edge sharpness while lower energies contain a complex convolution of broadening effects. In addition, it is demonstrated that intermediate energies lead to evenmore » more complex proximity effects that significantly reduce lateral edge sharpness and thus should be avoided if desiring high lateral resolution.« less

  7. Fundamental edge broadening effects during focused electron beam induced nanosynthesis

    PubMed Central

    Schmied, Roland; Fowlkes, Jason D; Winkler, Robert; Rack, Phillip D

    2015-01-01

    Summary The present study explores lateral broadening effects of 3D structures fabricated through focused electron beam induced deposition using MeCpPt(IV)Me3 precursor. In particular, the scaling behavior of proximity effects as a function of the primary electron energy and the deposit height is investigated through experiments and validated through simulations. Correlated Kelvin force microscopy and conductive atomic force microscopy measurements identified conductive and non-conductive proximity regions. It was determined that the highest primary electron energies enable the highest edge sharpness while lower energies contain a complex convolution of broadening effects. Moreover, it is demonstrated that intermediate energies lead to even more complex proximity effects that significantly reduce lateral edge sharpness and thus should be avoided if desiring high lateral resolution. PMID:25821687

  8. Fundamental edge broadening effects during focused electron beam induced nanosynthesis

    SciTech Connect

    Schmied, Roland; Fowlkes, Jason Davidson; Winkler, Robert; Rack, Phillip D.; Plank, Harald

    2015-02-16

    In this study, we explore lateral broadening effects of 3D structures fabricated through focused electron beam induced deposition using MeCpPt(IV)Me3 precursor. In particular, the scaling behavior of proximity effects as a function of the primary electron energy and the deposit height is investigated through experiments and validated through simulations. Correlated Kelvin force microscopy and conductive atomic force microscopy measurements identified conductive and non-conductive proximity regions. It was determined that the highest primary electron energies enable the highest edge sharpness while lower energies contain a complex convolution of broadening effects. In addition, it is demonstrated that intermediate energies lead to even more complex proximity effects that significantly reduce lateral edge sharpness and thus should be avoided if desiring high lateral resolution.

  9. Electron beam coupling to a metamaterial structure

    SciTech Connect

    French, David M.; Shiffler, Don; Cartwright, Keith

    2013-08-15

    Microwave metamaterials have shown promise in numerous applications, ranging from strip lines and antennas to metamaterial-based electron beam driven devices. In general, metamaterials allow microwave designers to obtain electromagnetic characteristics not typically available in nature. High Power Microwave (HPM) sources have in the past drawn inspiration from work done in the conventional microwave source community. In this article, the use of metamaterials in an HPM application is considered by using an effective medium model to determine the coupling of an electron beam to a metamaterial structure in a geometry similar to that of a dielectric Cerenkov maser. Use of the effective medium model allows for the analysis of a wide range of parameter space, including the “mu-negative,”“epsilon-negative,” and “double negative” regimes of the metamaterial. The physics of such a system are modeled analytically and by utilizing the particle-in-cell code ICEPIC. For this geometry and effective medium representation, optimum coupling of the electron beam to the metamaterial, and thus the optimum microwave or RF production, occurs in the epsilon negative regime of the metamaterial. Given that HPM tubes have been proposed that utilize a metamaterial, this model provides a rapid method of characterizing a source geometry that can be used to quickly understand the basic physics of such an HPM device.

  10. REBL nanowriter: Reflective Electron Beam Lithography

    NASA Astrophysics Data System (ADS)

    Petric, Paul; Bevis, Chris; Brodie, Alan; Carroll, Allen; Cheung, Anthony; Grella, Luca; McCord, Mark; Percy, Henry; Standiford, Keith; Zywno, Marek

    2009-03-01

    REBL (Reflective Electron Beam Lithography) is being developed for high throughput electron beam direct write maskless lithography. The system is specifically targeting 5 to 7 wafer levels per hour throughput on average at the 45 nm node, with extendibility to the 32 nm node and beyond. REBL incorporates a number of novel technologies to generate and expose lithographic patterns at estimated throughputs considerably higher than electron beam lithography has been able to achieve as yet. A patented reflective electron optic concept enables the unique approach utilized for the Digital Pattern Generator (DPG). The DPG is a CMOS ASIC chip with an array of small, independently controllable cells or pixels, which act as an array of electron mirrors. In this way, the system is capable of generating the pattern to be written using massively parallel exposure by ~1 million beams at extremely high data rates (~ 1Tbps). A rotary stage concept using a rotating platen carrying multiple wafers optimizes the writing strategy of the DPG to achieve the capability of high throughput for sparse pattern wafer levels. The exposure method utilized by the DPG was emulated on a Vistec VB-6 in order to validate the gray level exposure method used in REBL. Results of these exposure tests are discussed.

  11. Radiative cooling of relativistic electron beams.

    SciTech Connect

    Huang, Z.

    1999-04-14

    Radiative cooling is a natural and effective method of phase-space cooling for stored electron beams. In electron storage rings the average effects of synchrotron radiation from the bending magnets cause the beam emittances in all three degrees of freedom to damp towards equilibria, determined by the fluctuating nature of quantum emissions. In this paper, they show that the radiation damping in a focusing system is fundamentally different from that in a bending system. Quantum excitation to the transverse dimensions is absent in a straight, continuous focusing channel, and is exponentially suppressed in a focusing-dominated ring. Thus, the transverse normalized emittances in such systems can in principle be damped to the Compton wavelength of the electron, limited only by the Heisenberg Uncertainty Principle. In addition, they investigate methods of rapid damping such as radiative laser cooling. They propose a laser-electron storage ring (LESR) where the electron beam in a compact storage ring repetitively interacts with an intense laser pulse stored in an optical resonator. The laser-electron interaction gives rise to fast cooling of electron beams and can be used to overcome the space-charge effects encountered in a medium-energy circular machine. Applications to the designs of ultra-low-emittance damping rings and compact x-ray sources are also explored.

  12. Further remarks on electron beam pumping of laser materials.

    PubMed

    Klein, C A

    1966-12-01

    This article demonstrates that recently completed studies on the energy dissipation of kilovolt electron beams in solids provide readily applicable methods for assessing the situation in electron beam pumped lasers. PMID:20057662

  13. System of video observation for electron beam welding process

    NASA Astrophysics Data System (ADS)

    Laptenok, V. D.; Seregin, Y. N.; Bocharov, A. N.; Murygin, A. V.; Tynchenko, V. S.

    2016-04-01

    Equipment of video observation system for electron beam welding process was developed. Construction of video observation system allows to reduce negative effects on video camera during the process of electron beam welding and get qualitative images of this process.

  14. High-brightness electron beam diagnostics at the ATF

    SciTech Connect

    Wang, X.J.; Ben-Zvi, I.

    1996-07-01

    The Brookhaven Accelerator Test Facility (ATF) is a dedicated user facility for accelerator physicists. Its design is optimized to explore laser acceleration and coherent radiation production. To characterize the low-emittance, picoseconds long electron beam produced by the ATF`s photocathode RF gun, we have installed electron beam profile monitors for transverse emittance measurement, and developed a new technique to measure electron beam pulse length by chirping the electron beam energy. We have also developed a new technique to measure the ps slice emittance of a 10 ps long electron beam. Stripline beam position monitors were installed along the beam to monitor the electron beam position and intensity. A stripline beam position monitor was also used to monitor the timing jitter between the RF system and laser pulses. Transition radiation was used to measure electron beam energy, beam profile and electron beam bunch length.

  15. Silica-Ceria Hybrid Nanostructures

    SciTech Connect

    Munusamy, Prabhakaran; Sanghavi, Shail P.; Nachimuthu, Ponnusamy; Baer, Donald R.; Thevuthasan, Suntharampillai

    2012-04-25

    A new hybrid material system that consists of ceria attached silica nanoparticles has been developed. Because of the versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and antioxidant properties of ceria nanoparticles, this material system is ideally suited for biomedical applications. The silica particles of size ~50nm were synthesized by the Stöber synthesis method and ceria nanoparticles of size ~2-3nm was attached to the silica surface using a hetrocoagulation method. The presence of silanol groups on the surface of silica particles mediated homogenous nucleation of ceria which were attached to silica surface by Si-O-Ce bonding. The formations of silica-ceria hybrid nanostructures were characterized by X-photoelectron spectroscopy (XPS) and high resolution transmission electron microscopy (HRTEM). The HRTEM image confirms the formation of individual crystallites of ceria nanoparticles attached to the silica surface. The XPS analysis indicates that ceria nanoparticles are chemically bonded to surface of silica and possess mixture of +3 and +4 chemical states.

  16. Mass sensor for in situ monitoring of focused ion and electron beam induced processes

    SciTech Connect

    Friedli, Vinzenz; Santschi, Christian; Michler, Johann; Hoffmann, Patrik; Utke, Ivo

    2007-01-29

    A cantilever-based mass sensor for in situ monitoring of deposition and milling using focused ion and electron beams is presented. Carefully designed experiments allowed for mass measurements with a noise level of {+-}10 fg by tracking the resonance frequency of a temperature stabilized piezoresistive cantilever using phase locking. The authors report on measurements of precursor surface coverage, residence time, mass deposition rates, yields, and deposit density using the (CH{sub 3}){sub 3}PtCpCH{sub 3} precursor.

  17. Simulation of Electron-Beam Irradiation of Skin Tissue Model

    SciTech Connect

    Miller, John H.; Suleiman, Atef; Chrisler, William B.; Sowa, Marianne B.

    2011-01-03

    Monte Carlo simulation of electrons stopping in liquid water was used to model the penetration and dose distribution of electron beams incident on the full-thickness EpiDermTM skin model (MatTek, Ashland, VA). This 3D tissue model has a fully developed basement membrane separating an epidermal layer of keratinocytes in various stages of differentiation from a dermal layer of fibroblast embedded in collagen. The simulations were motivated by a desire to selectively expose the epidermal layer to low linear-energy-transfer (LET) radiation in the presence of a non-irradiated dermal layer. Using the variable energy electron microbeam at the Pacific Northwest National Laboratory (PNNL) as a model of device characteristics and irradiation geometry, we find that at the highest beam energy available (90 keV), the estimated 90th percentile of penetration remains in the epidermal layer. To investigate the depth-dose distribution, we calculated lineal energy spectra for 10um thick layers near the 10th, 50th, and 90th percentile of penetration by the 90 keV electron beam. Biphasic spectra showed an increasing component of "stoppers" with increasing depth. Despite changes in the lineal energy spectra, the main effect on dose deposition with increasing depth is the screening effect of tissue above the layer of interest.

  18. PURIFICATION OF IRIDIUM BY ELECTRON BEAM MELTING

    SciTech Connect

    Ohriner, Evan Keith

    2008-01-01

    The purification of iridium metal by electron beam melting has been characterized for 48 impurity elements. Chemical analysis was performed by glow discharge mass spectrographic (GDMS) analysis for all elements except carbon, which was analyzed by combustion. The average levels of individual elemental impurities in the starting powder varied from 37 g/g to 0.02 g/g. The impurity elements Li, Na, Mg, P, S, Cl, K, Ca, Mn, Co, Ni, Cu, Zn, As, Pd, Ag, Cd, Sn, Sb, Te, Ba, Ce, Tl, Pb, and Bi were not detectable following the purification. No significant change in concentration of the elements Ti, V, Zr, Nb, Mo, and Re was found. The elements B, C, Al, Si, Cr, Fe, Ru, Rh, and Pt were partially removed by vaporization during electron beam melting. Langmuir's equation for ideal vaporization into a vacuum was used to calculate for each impurity element the expected ratio of impurity content after melting to that before melting. Equilibrium vapor pressures were calculated using Henry's law, with activity coefficients obtained from published data for the elements Fe, Ti, and Pt. Activity coefficients were estimated from enthalpy data for Al, Si, V, Cr, Mn, Co, Ni, Zr, Nb, Mo, and Hf and an ideal solution model was used for the remaining elements. The melt temperature was determined from measured iridium weight loss. Excellent agreement was found between measured and calculated impurity ratios for all impurity elements. The results are consistent with some localized heating of the melt pool due to rastering of the electron beam, with an average vaporization temperature of 3100 K as compared to a temperature of 2965 K calculated for uniform heating of the melt pool. The results are also consistent with ideal mixing in the melt pool.

  19. Facile electron-beam lithography technique for irregular and fragile substrates

    SciTech Connect

    Chang, Jiyoung; Zhou, Qin; Zettl, Alex

    2014-10-27

    A facile technique is presented which enables high-resolution electron beam lithography on irregularly-shaped, non-planar or fragile substrates such as the edges of a silicon chip, thin and narrow suspended beams and bridges, or small cylindrical wires. The method involves a spin-free dry-transfer of pre-formed uniform-thickness polymethyl methacrylate, followed by conventional electron beam writing, metal deposition, and lift-off. High-resolution patterning is demonstrated for challenging target substrates. The technique should find broad application in micro- and nano-technology research arenas.

  20. Facile electron-beam lithography technique for irregular and fragile substrates

    NASA Astrophysics Data System (ADS)

    Chang, Jiyoung; Zhou, Qin; Zettl, Alex

    2014-10-01

    A facile technique is presented which enables high-resolution electron beam lithography on irregularly-shaped, non-planar or fragile substrates such as the edges of a silicon chip, thin and narrow suspended beams and bridges, or small cylindrical wires. The method involves a spin-free dry-transfer of pre-formed uniform-thickness polymethyl methacrylate, followed by conventional electron beam writing, metal deposition, and lift-off. High-resolution patterning is demonstrated for challenging target substrates. The technique should find broad application in micro- and nano-technology research arenas.

  1. The calculation of the dynamics of interaction between intense electron beams and dielectrics

    SciTech Connect

    Milyavskii, V.V.; Skvortsov, V.A.

    1995-09-01

    A mathematical model is constructed and a numerical investigation performed of the interaction between an intense relativistic electron beam and a solid high-molecular dielectric. The model is based on the equations of mechanics of continuum, electrodynamics, and kinetics, describing the accumulation and relaxation of space charge and shock-wave processes, as well as the evolution of electric field in the sample. A semiempirical procedure is proposed for the calculation of energy deposition by an electron beam in a target in the presence of a nonuniform electric field.

  2. Inspection applications with higher electron beam energies

    NASA Astrophysics Data System (ADS)

    Norman, D. R.; Jones, J. L.; Yoon, W. Y.; Haskell, K. J.; Sterbentz, J. W.; Zabriskie, J. M.; Hunt, A. W.; Harmon, F.; Kinlaw, M. T.

    2005-12-01

    The Idaho National Laboratory has developed prototype shielded nuclear material detection systems based on pulsed photonuclear assessment (PPA) techniques for the inspection of cargo containers. During this work, increased nuclear material detection capabilities have been demonstrated at higher electron beam energies than those allowed by federal regulations for cargo inspection. This paper gives a general overview of a nuclear material detection system, the PPA technique and discusses the benefits of using these higher energies. This paper also includes a summary of the numerical and test results from LINAC operations up to 24 MeV and discusses some of the federal energy limitations associated with cargo inspection.

  3. Electron beam induced growth of tin whiskers

    SciTech Connect

    Vasko, A. C.; Karpov, V. G.; Warrell, G. R.; Parsai, E. I.; Shvydka, Diana

    2015-09-28

    We have investigated the influence of electron irradiation on tin whisker growth. Sputtered tin samples exposed to electron beam of 6 MeV energy exhibited fast whisker growth, while control samples did not grow any whiskers. The statistics of e-beam induced whiskers was found to follow the log-normal distribution. The observed accelerated whisker growth is attributed to electrostatic effects due to charges trapped in an insulating substrate. These results offer promise for establishing whisker-related accelerated life testing protocols.

  4. Short rise time intense electron beam generator

    DOEpatents

    Olson, C.L.

    1984-03-16

    A generator for producing an intense relativisitc electron beam having a subnanosecond current rise time includes a conventional generator of intense relativistic electrons feeding into a short electrically conductive drift tube including a cavity containing a working gas at a low enough pressure to prevent the input beam from significantly ionizing the working gas. Ionizing means such as a laser simultaneously ionize the entire volume of working gas in the cavity to generate an output beam having a rise time less than one nanosecond.

  5. Short rise time intense electron beam generator

    DOEpatents

    Olson, Craig L.

    1987-01-01

    A generator for producing an intense relativistic electron beam having a subnanosecond current rise time includes a conventional generator of intense relativistic electrons feeding into a short electrically conductive drift tube including a cavity containing a working gas at a low enough pressure to prevent the input beam from significantly ionizing the working gas. Ionizing means such as a laser simultaneously ionize the entire volume of working gas in the cavity to generate an output beam having a rise time less than one nanosecond.

  6. Electron beam recording of optical disc

    NASA Astrophysics Data System (ADS)

    Cartwright, Giles; Reynolds, Gerald; Baylis, Chris; Pearce, Adrian; Dix, Colin; Ogilvie, Nick

    2002-09-01

    The Nimbus Technology & Engineering e -Beam Mastering System was developed to gain a large improvement in optical disc and structured hard disc recording capacity, significantly more than is possible from deep UV and SIL mastering. The current electron beam recorder is essentially a production machine capable of making full-length exposures at capacities of up to 50 GB with a simple low-cost upgrade path to disc capacities of several hundred gigabytes and beyond and hard disk drives (HDD) with capacities of up to 1 tera bit per square inch.

  7. Susceptor heating device for electron beam brazing

    DOEpatents

    Antieau, Susan M.; Johnson, Robert G. R.

    1999-01-01

    A brazing device and method are provided which locally apply a controlled amount of heat to a selected area, within a vacuum. The device brazes two components together with a brazing metal. A susceptor plate is placed in thermal contact with one of the components. A serrated pedestal supports the susceptor plate. When the pedestal and susceptor plate are in place, an electron gun irradiates an electron beam at the susceptor plate such that the susceptor plate is sufficiently heated to transfer heat through the one component and melt the brazing metal.

  8. Electron beam induced growth of tin whiskers

    NASA Astrophysics Data System (ADS)

    Vasko, A. C.; Warrell, G. R.; Parsai, E. I.; Karpov, V. G.; Shvydka, Diana

    2015-09-01

    We have investigated the influence of electron irradiation on tin whisker growth. Sputtered tin samples exposed to electron beam of 6 MeV energy exhibited fast whisker growth, while control samples did not grow any whiskers. The statistics of e-beam induced whiskers was found to follow the log-normal distribution. The observed accelerated whisker growth is attributed to electrostatic effects due to charges trapped in an insulating substrate. These results offer promise for establishing whisker-related accelerated life testing protocols.

  9. Intense steady state electron beam generator

    DOEpatents

    Hershcovitch, Ady; Kovarik, Vincent J.; Prelec, Krsto

    1990-01-01

    An intense, steady state, low emittance electron beam generator is formed by operating a hollow cathode discharge plasma source at critical levels in combination with an extraction electrode and a target electrode that are operable to extract a beam of fast primary electrons from the plasma source through a negatively biased grid that is critically operated to repel bulk electrons toward the plasma source while allowing the fast primary electrons to move toward the target in the desired beam that can be successfully transported for relatively large distances, such as one or more meters away from the plasma source.

  10. Intense steady state electron beam generator

    DOEpatents

    Hershcovitch, A.; Kovarik, V.J.; Prelec, K.

    1990-07-17

    An intense, steady state, low emittance electron beam generator is formed by operating a hollow cathode discharge plasma source at critical levels in combination with an extraction electrode and a target electrode that are operable to extract a beam of fast primary electrons from the plasma source through a negatively biased grid that is critically operated to repel bulk electrons toward the plasma source while allowing the fast primary electrons to move toward the target in the desired beam that can be successfully transported for relatively large distances, such as one or more meters away from the plasma source. 2 figs.