Science.gov

Sample records for extreme ultraviolet generation

  1. Generation of extreme ultraviolet vortex beams using computer generated holograms.

    PubMed

    Terhalle, Bernd; Langner, Andreas; Päivänranta, Birgit; Guzenko, Vitaliy A; David, Christian; Ekinci, Yasin

    2011-11-01

    We fabricate computer generated holograms for the generation of phase singularities at extreme ultraviolet (EUV) wavelengths using electron beam lithography and demonstrate their ability to generate optical vortices in the nonzero diffraction orders. To this end, we observe the characteristic intensity distribution of the vortex beam and verify the helical phase structure interferometrically. The presented method forms the basis for further studies on singular light fields in the EUV frequency range, i.e., in EUV interference lithography. Since the method is purely achromatic, it may also find applications in various fields of x ray optics. PMID:22048345

  2. Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography

    DOEpatents

    Hassanein, Ahmed; Konkashbaev, Isak

    2006-10-03

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.

  3. Attosecond extreme ultraviolet generation in cluster by using spatially inhomogeneous field

    SciTech Connect

    Feng, Liqiang; Liu, Hang

    2015-01-15

    A promising method to generate the attosecond extreme ultraviolet (XUV) sources has been theoretically investigated emerging from the two-dimensional Ar{sup +} cluster driven by the spatially inhomogeneous field. The results show that with the introduction of the Ar{sup +} cluster model, not only the harmonic cutoffs are enhanced, but also the harmonic yields are reinforced. Furthermore, by properly moderating the inhomogeneity as well as the laser parameters of the inhomogeneous field, the harmonic cutoff can be further extended. As a result, three almost linearly polarized XUV pulses with durations of 40 as, 42 as, and 45 as can be obtained.

  4. Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

    SciTech Connect

    Medvedev, V. V. Kruijs, R. W. E. van de; Yakshin, A. E.; Novikova, N. N.; Krivtsun, V. M.; Louis, E.; Bijkerk, F.; Yakunin, A. M.

    2013-11-25

    We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO{sub 2} laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.

  5. Spin-on-glass coatings for the generation of super-polishedsubstrates for extreme ultraviolet optics

    SciTech Connect

    Salmassi, Farhad; Naulleau, Patrick P.; Gullikson, Eric M.

    2005-01-01

    Substrates intended for use as extreme ultraviolet (EUV) optics have extremely stringent requirements in terms of finish. These requirements can dramatically increase the cost and fabrication time, especially when non-conventional shapes, such as toroids, are required. Here we present a spin-on-glass resist process capable of generating super-polished parts from inexpensive substrates. The method has been used to render diamond-turned substrates compatible for use as EUV optics. Toroidal diamond-turned optics with starting rms roughness in the 3.3 to 3.7 nm range have been smoothed to the 0.4 to 0.6 nm range. EUV reflectometry characterization of these optics has demonstrated reflectivities of approximately 63%.

  6. Extreme ultraviolet emission from dense plasmas generated with sub-10-fs laser pulses

    SciTech Connect

    Osterholz, J.; Brandl, F.; Cerchez, M.; Fischer, T.; Hemmers, D.; Hidding, B.; Pipahl, A.; Pretzler, G.; Willi, O.; Rose, S. J.

    2008-10-15

    The extreme ultraviolet (XUV) emission from dense plasmas generated with sub-10-fs laser pulses with varying peak intensities up to 3x10{sup 16} W/cm{sup 2} is investigated for different target materials. K shell spectra are obtained from low Z targets (carbon and boron nitride). In the spectra, a series limit for the hydrogen- and helium-like resonance lines is observed, indicating that the plasma is at high density and that pressure ionization has removed the higher levels. In addition, L shell spectra from titanium targets were obtained. Basic features of the K and L shell spectra are reproduced with computer simulations. The calculations include hydrodynamic simulation of the plasma expansion and collisional radiative calculations of the XUV emission.

  7. Extreme ultraviolet lithography machine

    DOEpatents

    Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

    2000-01-01

    An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  8. Extreme-Ultraviolet-Initated High-Order Harmonic Generation: Driving Inner-Valence Electrons Using Below-Threshold-Energy Extreme-Ultraviolet Light.

    PubMed

    Brown, A C; van der Hart, H W

    2016-08-26

    We propose a novel scheme for resolving the contribution of inner- and outer-valence electrons in extreme-ultraviolet (XUV)-initiated high-harmonic generation in neon. By probing the atom with a low-energy (below the 2s ionization threshold) ultrashort XUV pulse, the 2p electron is steered away from the core, while the 2s electron is enabled to describe recollision trajectories. By selectively suppressing the 2p recollision trajectories, we can resolve the contribution of the 2s electron to the high-harmonic spectrum. We apply the classical trajectory model to account for the contribution of the 2s electron, which allows for an intuitive understanding of the process. PMID:27610852

  9. Extreme ultraviolet source using a forced recombination process in lithium plasma generated by a pulsed laser

    NASA Astrophysics Data System (ADS)

    Nagano, Akihisa; Inoue, Takahiro; Nica, Petru-Edward; Amano, Sho; Miyamoto, Shuji; Mochizuki, Takayasu

    2007-04-01

    An extreme ultraviolet source having a tamper has been studied. This target scheme recombines forcedly lithium ions by low temperature electrons from the tamper, converting Li3+ rapidly to excited Li2+ which emit intense 1s-2p Lyman α emissions at 13.5nm. A strong 13.5nm emission appeared at 20-30ns after the time of laser peak within a small space volume near the tamper. The authors obtained an enhancement of extreme ultraviolet conversion efficiency by a factor of about 2 with the tamper against that of a target without the tamper at the same laser irradiation condition.

  10. Characterization of material ablation driven by laser generated intense extreme ultraviolet light

    NASA Astrophysics Data System (ADS)

    Tanaka, Nozomi; Masuda, Masaya; Deguchi, Ryo; Murakami, Masakatsu; Sunahara, Atsushi; Fujioka, Shinsuke; Yogo, Akifumi; Nishimura, Hiroaki

    2015-09-01

    We present a comparative study on the hydrodynamic behaviour of plasmas generated by material ablation by the irradiation of nanosecond extreme ultraviolet (EUV or XUV) or infrared laser pulses on solid samples. It was clarified that the difference in the photon energy deposition and following material heating mechanism between these two lights result in the difference in the plasma parameters and plasma expansion characteristics. Silicon plate was ablated by either focused intense EUV pulse (λ = 9-25 nm, 10 ns) or laser pulse (λ = 1064 nm, 10 ns), both with an intensity of ˜109 W/cm2. Both the angular distributions and energy spectra of the expanding ions revealed that the photoionized plasma generated by the EUV light differs significantly from that produced by the laser. The laser-generated plasma undergoes spherical expansion, whereas the EUV-generated plasma undergoes planar expansion in a comparatively narrow angular range. It is presumed that the EUV radiation is transmitted through the expanding plasma and directly photoionizes the samples in the solid phase, consequently forming a high-density and high-pressure plasma. Due to a steep pressure gradient along the direction of the target normal, the EUV plasma expands straightforward resulting in the narrower angular distribution observed.

  11. Characterization of material ablation driven by laser generated intense extreme ultraviolet light

    SciTech Connect

    Tanaka, Nozomi Masuda, Masaya; Deguchi, Ryo; Murakami, Masakatsu; Fujioka, Shinsuke; Yogo, Akifumi; Nishimura, Hiroaki; Sunahara, Atsushi

    2015-09-14

    We present a comparative study on the hydrodynamic behaviour of plasmas generated by material ablation by the irradiation of nanosecond extreme ultraviolet (EUV or XUV) or infrared laser pulses on solid samples. It was clarified that the difference in the photon energy deposition and following material heating mechanism between these two lights result in the difference in the plasma parameters and plasma expansion characteristics. Silicon plate was ablated by either focused intense EUV pulse (λ = 9–25 nm, 10 ns) or laser pulse (λ = 1064 nm, 10 ns), both with an intensity of ∼10{sup 9 }W/cm{sup 2}. Both the angular distributions and energy spectra of the expanding ions revealed that the photoionized plasma generated by the EUV light differs significantly from that produced by the laser. The laser-generated plasma undergoes spherical expansion, whereas the EUV-generated plasma undergoes planar expansion in a comparatively narrow angular range. It is presumed that the EUV radiation is transmitted through the expanding plasma and directly photoionizes the samples in the solid phase, consequently forming a high-density and high-pressure plasma. Due to a steep pressure gradient along the direction of the target normal, the EUV plasma expands straightforward resulting in the narrower angular distribution observed.

  12. Optimum concentration ratio of photodecomposable quencher to acid generator in chemically amplified extreme ultraviolet resists

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro

    2015-12-01

    In chemically amplified resists used for ionizing radiations such as an extreme ultraviolet radiation, thermalized electrons and protons play important roles in pattern formation. Photodecomposable quenchers are important for 11 nm half-pitch fabrication because they capture both thermalized electrons and protons. However, their effects are complicated for the same reason. In this study, the optimum concentration ratio of photodecomposable quenchers to acid generators in terms of the trade-off relationships between resolution, line width roughness (LWR), and sensitivity was theoretically investigated, assuming line-and-space patterns of 11 nm half-pitch. To suppress LWR to less than 20% critical dimension (CD), the recommended total sensitizer concentration (the sum of acid generator and photodecomposable quencher concentrations) was in the range of 0.20-0.22 nm-3. The expected sensitivities were 30-40 mJ cm-2 when the resist performance of the latest chemically amplified resists was assumed. The optimum ratio of photodecomposable quencher concentration to the total sensitizer concentration was 0.55.

  13. Spectroscopic measurements of ablation plasma generated with laser-driven intense extreme ultraviolet (EUV) light

    NASA Astrophysics Data System (ADS)

    Tanaka, N.; Hane, K.; Shikata, H.; Masuda, M.; Nagatomi, K.; Sunahara, A.; Yoshida, M.; Fujioka, S.; Nishimura, H.

    2016-03-01

    Material ablation by a focused Extreme ultraviolet (EUV) light is studied by comparing expanding ion properties and plasma parameters with laser ablation. The kinetic energy distributions of expanding ions from EUV and laser ablation showed different spectra implying different geometries of plasma expansion. The calculation results of plasma parameters showed that EUV energy is mostly deposited in high electron density region close to the solid density, while laser energy is deposited in low energy density region. Plasma parameters experimentally obtained from visible spectra did not show noticeable difference between EUV and laser ablation due to the corresponding low cut off density.

  14. Generation of high-resolution kagome lattice structures using extreme ultraviolet interference lithography

    NASA Astrophysics Data System (ADS)

    Wang, Li; Terhalle, Bernd; Guzenko, Vitaliy A.; Farhan, Alan; Hojeij, Mohamad; Ekinci, Yasin

    2012-08-01

    High-resolution kagome lattice structures with feature sizes down to the sub-50 nm regime are fabricated using diffraction-based extreme ultraviolet interference lithography. The resulting interference pattern of multiple beams is sensitive to the relative phase of the interfering beams. The precise control of their phases is achieved by precise positioning of transmission diffraction gratings on a mask using a high-end electron beam lithography tool. The presented method may find applications in providing high-resolution and large-area kagome lattice structures for studies on frustrated magnetic systems, photonic crystals, and plasmonics.

  15. Generation of bright phase-matched circularly-polarized extreme ultraviolet high harmonics

    NASA Astrophysics Data System (ADS)

    Kfir, Ofer; Grychtol, Patrik; Turgut, Emrah; Knut, Ronny; Zusin, Dmitriy; Popmintchev, Dimitar; Popmintchev, Tenio; Nembach, Hans; Shaw, Justin M.; Fleischer, Avner; Kapteyn, Henry; Murnane, Margaret; Cohen, Oren

    2015-02-01

    Circularly-polarized extreme ultraviolet and X-ray radiation is useful for analysing the structural, electronic and magnetic properties of materials. To date, such radiation has only been available at large-scale X-ray facilities such as synchrotrons. Here, we demonstrate the first bright, phase-matched, extreme ultraviolet circularly-polarized high harmonics source. The harmonics are emitted when bi-chromatic counter-rotating circularly-polarized laser pulses field-ionize a gas in a hollow-core waveguide. We use this new light source for magnetic circular dichroism measurements at the M-shell absorption edges of Co. We show that phase-matching of circularly-polarized harmonics is unique and robust, producing a photon flux comparable to linearly polarized high harmonic sources. This work represents a critical advance towards the development of table-top systems for element-specific imaging and spectroscopy of multiple elements simultaneously in magnetic and other chiral media with very high spatial and temporal resolution.

  16. Spin-resolved photoelectron spectroscopy using femtosecond extreme ultraviolet light pulses from high-order harmonic generation.

    PubMed

    Plötzing, M; Adam, R; Weier, C; Plucinski, L; Eich, S; Emmerich, S; Rollinger, M; Aeschlimann, M; Mathias, S; Schneider, C M

    2016-04-01

    The fundamental mechanism responsible for optically induced magnetization dynamics in ferromagnetic thin films has been under intense debate since almost two decades. Currently, numerous competing theoretical models are in strong need for a decisive experimental confirmation such as monitoring the triggered changes in the spin-dependent band structure on ultrashort time scales. Our approach explores the possibility of observing femtosecond band structure dynamics by giving access to extended parts of the Brillouin zone in a simultaneously time-, energy- and spin-resolved photoemission experiment. For this purpose, our setup uses a state-of-the-art, highly efficient spin detector and ultrashort, extreme ultraviolet light pulses created by laser-based high-order harmonic generation. In this paper, we present the setup and first spin-resolved spectra obtained with our experiment within an acquisition time short enough to allow pump-probe studies. Further, we characterize the influence of the excitation with femtosecond extreme ultraviolet pulses by comparing the results with data acquired using a continuous wave light source with similar photon energy. In addition, changes in the spectra induced by vacuum space-charge effects due to both the extreme ultraviolet probe- and near-infrared pump-pulses are studied by analyzing the resulting spectral distortions. The combination of energy resolution and electron count rate achieved in our setup confirms its suitability for spin-resolved studies of the band structure on ultrashort time scales. PMID:27131684

  17. Spin-resolved photoelectron spectroscopy using femtosecond extreme ultraviolet light pulses from high-order harmonic generation

    NASA Astrophysics Data System (ADS)

    Plötzing, M.; Adam, R.; Weier, C.; Plucinski, L.; Eich, S.; Emmerich, S.; Rollinger, M.; Aeschlimann, M.; Mathias, S.; Schneider, C. M.

    2016-04-01

    The fundamental mechanism responsible for optically induced magnetization dynamics in ferromagnetic thin films has been under intense debate since almost two decades. Currently, numerous competing theoretical models are in strong need for a decisive experimental confirmation such as monitoring the triggered changes in the spin-dependent band structure on ultrashort time scales. Our approach explores the possibility of observing femtosecond band structure dynamics by giving access to extended parts of the Brillouin zone in a simultaneously time-, energy- and spin-resolved photoemission experiment. For this purpose, our setup uses a state-of-the-art, highly efficient spin detector and ultrashort, extreme ultraviolet light pulses created by laser-based high-order harmonic generation. In this paper, we present the setup and first spin-resolved spectra obtained with our experiment within an acquisition time short enough to allow pump-probe studies. Further, we characterize the influence of the excitation with femtosecond extreme ultraviolet pulses by comparing the results with data acquired using a continuous wave light source with similar photon energy. In addition, changes in the spectra induced by vacuum space-charge effects due to both the extreme ultraviolet probe- and near-infrared pump-pulses are studied by analyzing the resulting spectral distortions. The combination of energy resolution and electron count rate achieved in our setup confirms its suitability for spin-resolved studies of the band structure on ultrashort time scales.

  18. Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources

    SciTech Connect

    Cummins, T.; O'Gorman, C.; Dunne, P.; Sokell, E.; O'Sullivan, G.; Hayden, P.

    2014-07-28

    Colliding plasmas produced by neodymium-doped yttrium aluminium garnet (Nd:YAG) laser illumination of tin wedge targets form stagnation layers, the physical parameters of which can be controlled to optimise coupling with a carbon dioxide (CO{sub 2}) heating laser pulse and subsequent extreme ultraviolet (EUV) production. The conversion efficiency (CE) of total laser energy into EUV emission at 13.5 nm ± 1% was 3.6%. Neglecting both the energy required to form the stagnation layer and the EUV light produced before the CO{sub 2} laser pulse is incident results in a CE of 5.1% of the CO{sub 2} laser energy into EUV light.

  19. Extreme ultraviolet lithography patterned mask defect detection performance evaluation toward 16- to 11-nm half-pitch generation

    NASA Astrophysics Data System (ADS)

    Hirano, Ryoichi; Iida, Susumu; Amano, Tsuyoshi; Watanabe, Hidehiro; Hatakeyama, Masahiro; Murakami, Takeshi; Yoshikawa, Shoji; Terao, Kenji

    2015-07-01

    High-sensitivity and low-noise extreme ultraviolet (EUV) mask pattern defect detection is one of the major issues remaining to be addressed in device fabrication using extreme ultraviolet lithography (EUVL). We have designed a projection electron microscopy (PEM) system, which has proven to be quite promising for half-pitch (hp) 16-nm node to hp 11-nm node mask inspection. The PEM system was integrated into a pattern inspection system for defect detection sensitivity evaluation. To improve the performance of hp 16-nm patterned mask defect detection toward hp 11-nm EUVL patterned mask, defect detection signal characteristics, which depend on hp 64-nm pattern image intensity deviation on EUVL mask, were studied. Image adjustment effect of the captured images for die-to-die defect detection was evaluated before the start of the defect detection image-processing sequence. Image correction of intrafield intensity unevenness and L/S pattern image contrast deviation suppresses the generation of false defects. Captured images of extrusion and intrusion defects in hp 64-nm L/S patterns were used for detection. Applying the image correction for defect detection, 12-nm sized intrusion defect, which was smaller than our target size for hp 16-nm defect detection requirements, was identified without false defects.

  20. Generation of an extreme ultraviolet supercontinuum and isolated sub-50 as pulse in a two-colour laser field

    NASA Astrophysics Data System (ADS)

    Zhang, Gang-Tai; Liu, Xue-Shen

    2009-06-01

    We theoretically study high-order harmonic generation when a helium ion is exposed to a two-colour laser field, which is synthesized by a 5 fs/800 nm laser pulse and a 64 fs/2400 nm laser pulse. Our numerical results show that the harmonic spectrum exhibits an ultrabroad extreme ultraviolet supercontinuum when the initial state is prepared as a coherent superposition of the ground state and the first excited state. By superposing a series of properly selected harmonics, an isolated attosecond pulse with a duration of 47 as is obtained. Compared with the case of the ground state in a one-colour field, the intensity of this isolated attosecond pulse is six orders of magnitude higher. We also demonstrate these results in terms of the time-frequency analysis and the semiclassical three-step model.

  1. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    2000-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  2. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, Glenn D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  3. The Extreme Ultraviolet Explorer mission

    NASA Technical Reports Server (NTRS)

    Welsh, Barry Y.

    1991-01-01

    The Extreme Ultraviolet Explorer (EUVE) is a NASA astronomy mission which will operate in the 70-760A spectral band. The science payload consists of three grazing incidence scanning telescopes and an EUV spectrometer/deep survey instrument. An overview of the planned mission profile is given, and the instrumentation which comprises the science payload is discussed. The EUVE is scheduled for launch in late August 1991.

  4. HELIOS—A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy

    SciTech Connect

    Plogmaker, S. E-mail: Joachim.Terschluesen@physics.uu.se Terschlüsen, J. A. E-mail: Joachim.Terschluesen@physics.uu.se Krebs, N.; Svanqvist, M.; Forsberg, J.; Cappel, U. B.; Rubensson, J.-E.; Siegbahn, H.; Söderström, J. E-mail: Joachim.Terschluesen@physics.uu.se

    2015-12-15

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20 000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ⋅ 10{sup 10} photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization.

  5. HELIOS--A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy.

    PubMed

    Plogmaker, S; Terschlüsen, J A; Krebs, N; Svanqvist, M; Forsberg, J; Cappel, U B; Rubensson, J-E; Siegbahn, H; Söderström, J

    2015-12-01

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20,000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ⋅ 10(10) photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization. PMID:26724006

  6. Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generation

    NASA Astrophysics Data System (ADS)

    Hirano, Ryoichi; Iida, Susumu; Amano, Tsuyoshi; Watanabe, Hidehiro; Hatakeyama, Masahiro; Murakami, Takeshi; Suematsu, Kenichi; Terao, Kenji

    2016-03-01

    Novel projection electron microscope optics have been developed and integrated into a new inspection system named EBEYE-V30 ("Model EBEYE" is an EBARA's model code) , and the resulting system shows promise for application to half-pitch (hp) 16-nm node extreme ultraviolet lithography (EUVL) patterned mask inspection. To improve the system's inspection throughput for 11-nm hp generation defect detection, a new electron-sensitive area image sensor with a high-speed data processing unit, a bright and stable electron source, and an image capture area deflector that operates simultaneously with the mask scanning motion have been developed. A learning system has been used for the mask inspection tool to meet the requirements of hp 11-nm node EUV patterned mask inspection. Defects are identified by the projection electron microscope system using the "defectivity" from the characteristics of the acquired image. The learning system has been developed to reduce the labor and costs associated with adjustment of the detection capability to cope with newly-defined mask defects. We describe the integration of the developed elements into the inspection tool and the verification of the designed specification. We have also verified the effectiveness of the learning system, which shows enhanced detection capability for the hp 11-nm node.

  7. High-peak-power surface high-harmonic generation at extreme ultra-violet wavelengths from a tape

    SciTech Connect

    Shaw, B. H.; Tilborg, J. van; Sokollik, T.; Schroeder, C. B.; McKinney, W. R.; Artemiev, N. A.; Yashchuk, V. V.; Gullikson, E. M.; Leemans, W. P.

    2013-07-28

    Solid-based surface high-harmonic generation from a tape is experimentally studied. By operating at mildly relativistic normalized laser strengths a{sub 0}≲0.2, harmonics up to the 17th order are efficiently produced in the coherent wake emission (CWE) regime. CWE pulse properties, such as divergence, energy, conversion efficiency, and spectrum, are investigated for various tape materials and drive laser conditions. A clear correlation between surface roughness and harmonic beam divergence is found. At the measured pulse properties for the 15th harmonic (conversion efficiency ∼6.5×10{sup −7}, divergence ∼7−15 mrad), the 100-mJ-level drive laser produces several MWs of extreme ultra-violet pulses. The spooling tape configuration enables multi-Hz operation over thousands of shots, making this source attractive as a seed to the few-Hz laser-plasma-accelerator-driven free-electron laser (FEL). Models indicate that these CWE pulses with MW level powers are sufficient for seed-induced bunching and FEL gain.

  8. Optimization of Extreme Ultraviolet Light Source from High Harmonic Generation for Condensed-Phase Core-Level Spectroscopy

    NASA Astrophysics Data System (ADS)

    Lin, Ming-Fu; Verkamp, Max A.; Ryland, Elizabeth S.; Benke, Kristin; Zhang, Kaili; Carlson, Michaela; Vura-Weis, Josh

    2015-06-01

    Extreme ultraviolet (XUV) light source from high-order harmonic generation has been shown to be a powerful tool for core-level spectroscopy. In addition, this light source provides very high temporal resolution (10-18 s to 10-15 s) for time-resolved transient absorption spectroscopy. Most applications of the light source have been limited to the studies of atomic and molecular systems, with technique development focused on optimizing for shorter pulses (i.e. tens of attoseconds) or higher XUV energy (i.e. ~keV range). For the application to general molecular systems in solid and liquid forms, however, the XUV photon flux and stability are highly demanded due to the strong absorption by substrates and solvents. In this case, the main limitation is due to the stability of the high order generation process and the limited bandwidth of the XUV source that gives only discrete even/odd order peaks. Consequently, this results in harmonic artifact noise that overlaps with the resonant signal. In our current study, we utilize a semi-infinite cell for high harmonic generation from two quantum trajectories (i.e. short and long) at over-driven NIR power. This condition, produces broad XUV spectrum without using complicated optics (e.g. hollow-core fibers and double optical gating). This light source allows us to measure the static absorption spectrum of the iron M-edge from a Fe(acac)3 molecular solid film, which shows a resonant feature of 0.01 OD (~2.3% absorption). Moreover, we also investigate how sample roughness affects the static absorption spectrum. We are able to make smooth solar cell precursor materials (i.e. PbI2 and PbBr2) by spin casting and observe iodine (50 eV) and bromine (70 eV) absorption edges in the order of 0.05 OD with minimal harmonic artifact noise.

  9. Extreme ultraviolet photoionization of aldoses and ketoses

    NASA Astrophysics Data System (ADS)

    Shin, Joong-Won; Dong, Feng; Grisham, Michael E.; Rocca, Jorge J.; Bernstein, Elliot R.

    2011-04-01

    Gas phase monosaccharides (2-deoxyribose, ribose, arabinose, xylose, lyxose, glucose galactose, fructose, and tagatose), generated by laser desorption of solid sample pellets, are ionized with extreme ultraviolet photons (EUV, 46.9 nm, 26.44 eV). The resulting fragment ions are analyzed using a time of flight mass spectrometer. All aldoses yield identical fragment ions regardless of size, and ketoses, while also generating same ions as aldoses, yields additional features. Extensive fragmentation of the monosaccharides is the result the EUV photons ionizing various inner valence orbitals. The observed fragmentation patterns are not dependent upon hydrogen bonding structure or OH group orientation.

  10. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Labov, S. E.

    1985-01-01

    Instruments designed to explore different aspects of far and extreme ultraviolet cosmic radiation were studied. The far ultraviolet imager (FUVI) was flown on the Aries sounding rocket. Its unique large format 75mm detector mapped out the far ultraviolet background radiation with a resolution of only a few arc minutes. Analysis of this data indicates to what extent the FUVI background is extra galactic in origin. A power spectrum of the spatial fluctuations will have direct consequences for galactic evolution.

  11. Masks for extreme ultraviolet lithography

    SciTech Connect

    Cardinale, G; Goldsmith, J; Kearney, P A; Larson, C; Moore, C E; Prisbrey, S; Tong, W; Vernon, S P; Weber, F; Yan, P-Y

    1998-09-01

    In extreme ultraviolet lithography (EUVL), the technology specific requirements on the mask are a direct consequence of the utilization of radiation in the spectral region between 10 and 15 nm. At these wavelengths, all condensed materials are highly absorbing and efficient radiation transport mandates the use of all-reflective optical systems. Reflectivity is achieved with resonant, wavelength-matched multilayer (ML) coatings on all of the optical surfaces - including the mask. The EUV mask has a unique architecture - it consists of a substrate with a highly reflective ML coating (the mask blank) that is subsequently over-coated with a patterned absorber layer (the mask). Particulate contamination on the EUVL mask surface, errors in absorber definition and defects in the ML coating all have the potential to print in the lithographic process. While highly developed technologies exist for repair of the absorber layer, no viable strategy for the repair of ML coating defects has been identified. In this paper the state-of-the-art in ML deposition technology, optical inspection of EUVL mask blank defects and candidate absorber patterning approaches are reviewed.

  12. Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target

    NASA Astrophysics Data System (ADS)

    Ueno, Yoshifumi; Ariga, Tatsuya; Soumagne, George; Higashiguchi, Takeshi; Kubodera, Shoichi; Pogorelsky, Igor; Pavlishin, Igor; Stolyarov, Daniil; Babzien, Marcus; Kusche, Karl; Yakimenko, Vitaly

    2007-05-01

    We demonstrated efficacy of a CO2-laser-produced xenon plasma in the extreme ultraviolet (EUV) spectral region at 13.5nm at variable laser pulse widths between 200ps and 25ns. The plasma target was a 30μm liquid xenon microjet. To ensure the optimum coupling of CO2 laser energy with the plasma, they applied a prepulse yttrium aluminum garnet laser. The authors measured the conversion efficiency (CE) of the 13.5nm EUV emission for different pulse widths of the CO2 laser. A maximum CE of 0.6% was obtained for a CO2 laser pulse width of 25ns at an intensity of 5×1010W/cm2.

  13. Astronomy and the Extreme Ultraviolet Explorer satellite

    NASA Technical Reports Server (NTRS)

    Bowyer, S.

    1994-01-01

    The extreme ultraviolet wave band (100 to 912 angstroms) was thought until recently to be useless to astronomy, primarily because the opacity of the interstellar medium would prevent observations at these wavelengths. However, the interstellar medium has been found to be markedly inhomogeneous in both density and ionization state and the sun is fortunately located in a region of low extreme ultraviolet opacity. The Extreme Ultraviolet Explorer, launched in June 1992, has surveyed the sky in this wave band and has detected a wide variety of astronomical sources at considerable distances, including some extragalactic objects. Studies in the extreme ultraviolet band have already begun to increase our understanding of the contents of the universe.

  14. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1985-01-01

    The Far Ultraviolet imager (FUVI) was flown on the Aries class sounding rocket 24.015, producing outstanding results. The diffuse extreme ultraviolet (EUV) background spectrometer which is under construction is described. It will be launched on the Black Brant sounding rocket flight number 27.086. Ongoing design studies of a high resolution spectrometer are discussed. This instrument incorporates a one meter normal incidence mirror and will be suitable for an advanced Spartan mission.

  15. Photoresist composition for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  16. Far-infrared-light shadowgraphy for high extraction efficiency of extreme ultraviolet light from a CO2-laser-generated tin plasma

    NASA Astrophysics Data System (ADS)

    Matsukuma, Hiraku; Hosoda, Tatsuya; Suzuki, Yosuke; Yogo, Akifumi; Yanagida, Tatsuya; Kodama, Takeshi; Nishimura, Hiroaki

    2016-08-01

    The two-color, double-pulse method is an efficient scheme to generate extreme ultraviolet light for fabricating the next generation semiconductor microchips. In this method, a Nd:YAG laser pulse is used to expand a several-tens-of-micrometers-scale tin droplet, and a CO2 laser pulse is subsequently directed at the expanded tin vapor after an appropriate delay time. We propose the use of shadowgraphy with a CO2 laser probe-pulse scheme to optimize the CO2 main-drive laser. The distribution of absorption coefficients is derived from the experiment, and the results are converted to a practical absorption rate for the CO2 main-drive laser.

  17. Far and extreme ultraviolet astronomy with ORFEUS

    NASA Technical Reports Server (NTRS)

    Kraemer, G.; Barnstedt, J.; Eberhard, N.; Grewing, M.; Gringel, W.; Haas, C.; Kaelble, A.; Kappelmann, N.; Petrik, J.; Appenzeller, I.

    1990-01-01

    ORFEUS (Orbiting and Retrievable Far and Extreme Ultraviolet Spectrometer) is a 1 m normal incidence telescope for spectroscopic investigations of cosmic sources in the far and extreme ultraviolet spectral range. The instrument will be integrated into the freeflyer platform ASTRO-SPAS. ORFEUS-SPAS is scheduled with STS ENDEAVOUR in September 1992. We describe the telescope with its two spectrometer and their capabilities i.e., spectral range, resolution and overall sensitivity. The main classes of objects to be observed with the instrument are discussed and two examples of simulated spectra for the white dwarf HZ43 and an O9-star in LMC are shown.

  18. Forecasting solar extreme and far ultraviolet irradiance

    NASA Astrophysics Data System (ADS)

    Henney, C. J.; Hock, R. A.; Schooley, A. K.; Toussaint, W. A.; White, S. M.; Arge, C. N.

    2015-03-01

    A new method is presented to forecast the solar irradiance of selected wavelength ranges within the extreme ultraviolet (EUV) and far ultraviolet (FUV) bands. The technique is similar to a method recently published by Henney et al. (2012) to predict solar 10.7 cm (2.8 GHz) radio flux, abbreviated F10.7, utilizing advanced predictions of the global solar magnetic field generated by a flux transport model. In this and the previous study, we find good correlation between the absolute value of the observed photospheric magnetic field and selected EUV/FUV spectral bands. By evolving solar magnetic maps forward 1 to 7 days with a flux transport model, estimations of the Earth side solar magnetic field distribution are generated and used to forecast irradiance. For example, Pearson correlation coefficient values of 0.99, 0.99, and 0.98 are found for 1 day, 3 day, and 7 day predictions, respectively, of the EUV band from 29 to 32 nm. In the FUV, for example, the 160 to 165 nm spectral band, correlation values of 0.98, 0.97, and 0.96 are found for 1 day, 3 day, and 7 day predictions, respectively. In the previous study, the observed F10.7 signal is found to correlate well with strong magnetic field (i.e., sunspot) regions. Here we find that solar EUV and FUV signals are significantly correlated with the weaker magnetic fields associated with plage regions, suggesting that solar magnetic indices may provide an improved indicator (relative to the widely used F10.7 signal) of EUV and FUV nonflaring irradiance variability as input to ionospheric and thermospheric models.

  19. Coherence techniques at extreme ultraviolet wavelengths

    SciTech Connect

    Chang, Chang

    2002-10-01

    The renaissance of Extreme Ultraviolet (EUV) and soft x-ray (SXR) optics in recent years is mainly driven by the desire of printing and observing ever smaller features, as in lithography and microscopy. This attribute is complemented by the unique opportunity for element specific identification presented by the large number of atomic resonances, essentially for all materials in this range of photon energies. Together, these have driven the need for new short-wavelength radiation sources (e.g. third generation synchrotron radiation facilities), and novel optical components, that in turn permit new research in areas that have not yet been fully explored. This dissertation is directed towards advancing this new field by contributing to the characterization of spatial coherence properties of undulator radiation and, for the first time, introducing Fourier optical elements to this short-wavelength spectral region. The first experiment in this dissertation uses the Thompson-Wolf two-pinhole method to characterize the spatial coherence properties of the undulator radiation at Beamline 12 of the Advanced Light Source. High spatial coherence EUV radiation is demonstrated with appropriate spatial filtering. The effects of small vertical source size and beamline apertures are observed. The difference in the measured horizontal and vertical coherence profile evokes further theoretical studies on coherence propagation of an EUV undulator beamline. A numerical simulation based on the Huygens-Fresnel principle is performed.

  20. Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies

    SciTech Connect

    Wilson, Daniel; Rudolf, Denis Juschkin, Larissa; Weier, Christian; Adam, Roman; Schneider, Claus M.; Winkler, Gerrit; Frömter, Robert; Danylyuk, Serhiy; Bergmann, Klaus; Grützmacher, Detlev

    2014-10-15

    Generation of circularly polarized light in the extreme ultraviolet (EUV) spectral region (about 25 eV–250 eV) is highly desirable for applications in spectroscopy and microscopy but very challenging to achieve in a small-scale laboratory. We present a compact apparatus for generation of linearly and circularly polarized EUV radiation from a gas-discharge plasma light source between 50 eV and 70 eV photon energy. In this spectral range, the 3p absorption edges of Fe (54 eV), Co (60 eV), and Ni (67 eV) offer a high magnetic contrast often employed for magneto-optical and electron spectroscopy as well as for magnetic imaging. We simulated and designed an instrument for generation of linearly and circularly polarized EUV radiation and performed polarimetric measurements of the degree of linear and circular polarization. Furthermore, we demonstrate first measurements of the X-ray magnetic circular dichroism at the Co 3p absorption edge with a plasma-based EUV light source. Our approach opens the door for laboratory-based, element-selective spectroscopy of magnetic materials and spectro-microscopy of ferromagnetic domains.

  1. Extreme Ultraviolet Explorer Science Operation Center

    NASA Technical Reports Server (NTRS)

    Wong, G. S.; Kronberg, F. A.; Meriwether, H. D.; Wong, L. S.; Grassi, C. L.

    1993-01-01

    The EUVE Science Operations Center (ESOC) is a satellite payload operations center for the Extreme Ultraviolet Explorer project, located on the Berkeley campus of the University of California. The ESOC has the primary responsibility for commanding the EUVE telescopes and monitoring their telemetry. The ESOC is one of a very few university-based satellite operations facilities operating with NASA. This article describes the history, operation, and advantages of the ESOC as an on-campus operations center.

  2. The Solar Extreme Ultraviolet Monitor for MAVEN

    NASA Astrophysics Data System (ADS)

    Eparvier, F. G.; Chamberlin, P. C.; Woods, T. N.; Thiemann, E. M. B.

    2015-12-01

    The Extreme Ultraviolet (EUV) monitor is an instrument on the NASA Mars Atmosphere and Volatile EvolutioN (MAVEN) mission, designed to measure the variability of the solar soft x-rays and EUV irradiance at Mars. The solar output in this wavelength range is a primary energy input to the Mars atmosphere and a driver for the processes leading to atmospheric escape. The MAVEN EUV monitor consists of three broadband radiometers. The radiometers consist of silicon photodiodes with different bandpass-limiting filters for each channel. The filters for the radiometers are: Channel A: thin foil C/Al/Nb/C for 0.1-3 nm and 17-22 nm, Channel B: thin foil C/Al/Ti/C for 0.1-7 nm, and Channel C: interference filter for 121-122 nm. A fourth, covered photodiode is used to monitor variations in dark signal due to temperature and radiation background changes. The three science channels will monitor emissions from the highly variable corona and transition region of the solar atmosphere. The EUV monitor is mounted on the top deck of the MAVEN spacecraft and is pointed at the Sun for most of its orbit around Mars. The measurement cadence is 1-second. The broadband irradiances can be used to monitor the most rapid changes in solar irradiance due to flares. In combination with time-interpolated observations at Earth of slower varying solar spectral emissions, the broadband MAVEN EUV monitor measurements will also be used in a spectral irradiance model to generate the full EUV spectrum at Mars from 0 to 190 nm in 1-nm bins on a time cadence of 1-minute and daily averages.

  3. Experimental limits of the extreme ultraviolet background

    NASA Technical Reports Server (NTRS)

    Wulf-Mathies, C.; Grewing, M.; Kraemer, G.; Schulz-Luepertz, E.; Kimble, R.; Bixler, J.; Bowyer, S.

    1983-01-01

    Photometric observations of the diffuse extreme ultraviolet background with two photometers having bandpasses of 750-940 A and 1040-1080 A are reported. The payload, which was flown aboard an ARIES sounding rocket in June 1982, is described, including the electron detectors, filters, and calibration. The operation of the probe during the experiment, including its motions, are described. The primary experiment involved spectroscopic observation of the hot white dwarf HZ43. The photometer count rate is shown and the measurements of the diffuse background are compared with theoretical predictions. Despite the lower limits obtained using a narrowband detector, the measurements are not sensitive enough to draw any relevant astrophysical conclusions.

  4. Imaging the magnetosphere in the extreme ultraviolet

    NASA Technical Reports Server (NTRS)

    Chiu, Y. T.

    1993-01-01

    A final report on research on magnetosphere imaging in the extreme ultraviolet is presented. The objectives of the research contract can be summarized in three related items: (1) investigate the feasibility of the EUV imaging concept by using Lockheed in-situ ion measurement data; (2) investigate the technical resources required to make scientific interpretations of such EUV images by end-to-end simulations of the imaging concept; and (3) construct and test the key element for EUV magnetosphere imaging, the multilayer mirror with normal-incidence reflectance designed for the selected solar resonance line.

  5. Absolute sensitivity calibration of extreme ultraviolet photoresists

    SciTech Connect

    Jones, Juanita; Naulleau, Patrick P.; Gullikson, Eric M.; Aquila, Andrew; George, Simi; Niakoula, Dimitra

    2008-05-16

    One of the major challenges facing the commercialization of extreme ultraviolet (EUV) lithography remains simultaneously achieving resist sensitivity, line-edge roughness, and resolution requirement. Sensitivity is of particular concern owing to its direct impact on source power requirements. Most current EUV exposure tools have been calibrated against a resist standard with the actual calibration of the standard resist dating back to EUV exposures at Sandia National Laboratories in the mid 1990s. Here they report on an independent sensitivity calibration of two baseline resists from the SEMATECH Berkeley MET tool performed at the Advanced Light Source Calibrations and Standards beamline. The results show the baseline resists to be approximately 1.9 times faster than previously thought based on calibration against the long standing resist standard.

  6. Femtosecond transparency in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Tarana, Michal; Greene, Chris H.

    2012-06-01

    Electromagnetically induced transparency-like behavior in the extreme ultraviolet (XUV) is studied theoretically, including the effect of intense 800nm laser dressing of He 2s2p(^1P^o) and 2p^2(^2S^e) autoionizing states. We present an ab initio solution of the time-dependent Schr"odinger equation in an LS-coupling configuration interaction basis set. The method enables a rigorous treatment of optical field ionization of these coupled autoionizing states into the N = 2 continuum in addition to N = 1. Our calculated transient absorption spectra show the formation of the Autler-Townes doublet in the presence of the dressing laser field. The presented results are in encouraging agreement with experiment [1]. [4pt] [1] Z.H. Loh, C.H. Greene, and S. R. Leone, Chem. Phys. 350, 7 (2008)

  7. The Extreme Ultraviolet Explorer - Overview and calibration

    NASA Technical Reports Server (NTRS)

    Welsh, Barry Y.; Vallerga, John V.; Jelinsky, Pat; Vedder, Peter W.; Bowyer, Stuart

    1990-01-01

    The Extreme Ultraviolet Explorer (EUVE) is a NASA-funded astronomy mission that will operate in the 70 to 760 A band. The science payload, which has been designed and built by the Space Sciences Laboratory at the University of California, Berkeley, consists of three grazing incidence scanning telescopes and an EUV spectrometer/deep survey instrument. This paper gives details of the planned mission profile and an overview of the instrumentation that the science payload comprises. Topics such as the thermal design, contamination control, and details of the electronics system are discussed. Finally, the results of the calibration of the various subsystems that make up the EUVE instrumentation are reviewed, and the calibration plan for the integrated EUVE instruments is discussed.

  8. Extreme-Ultraviolet Observations of Nine Pulsars

    NASA Astrophysics Data System (ADS)

    Seon, Kwang-Il; Edelstein, Jerry

    1998-05-01

    We report the observation of nine pulsars using the Lexan (100 Å) band of the Extreme Ultraviolet Explorer scanning telescopes. The observations, none of which resulted in positive detections, are used to derive limits to the temperature of surface thermal radiation from the objects. We compare the temperature limits with predictions from neutron star cooling models. The N_H I toward our targets limits our ability to establish rigorous limits needed to discriminate among the models. We also derive a limit to heating by magnetic monopole flux-catalyzed nucleon decay for the very old pulsar PSR J1455-3330, which is similar to the limit derived for PSR B1929+10 and 3 orders of magnitude larger than the limit for PSR J0437-4715.

  9. Modeling extreme ultraviolet suppression of electrostatic analyzers

    SciTech Connect

    Gershman, Daniel J.; Zurbuchen, Thomas H.

    2010-04-15

    In addition to analyzing energy-per-charge ratios of incident ions, electrostatic analyzers (ESAs) for spaceborne time-of-flight mass spectrometers must also protect detectors from extreme ultraviolet (EUV) photons from the Sun. The required suppression rate often exceeds 1:10{sup 7} and is generally established in tests upon instrument design and integration. This paper describes a novel technique to model the EUV suppression of ESAs using photon ray tracing integrated into SIMION, the most commonly used ion optics design software for such instruments. The paper compares simulation results with measurements taken from the ESA of the Mass instrument flying onboard the Wind spacecraft. This novel technique enables an active inclusion of EUV suppression requirements in the ESA design process. Furthermore, the simulation results also motivate design rules for such instruments.

  10. Reaction Mechanism of Extreme Ultraviolet Resists

    NASA Astrophysics Data System (ADS)

    Toriumi, Minoru; Kaneyama, Koji; Itani, Toshiro

    2008-06-01

    Molecular resist of polyphenol was evaluated as an extreme-ultraviolet resist compared with a polymer resist of poly(tert-butoxycarbonylhydroxystyrene). X-ray reflectometry was used to determine the resist-film density and measurement accuracy was improved. The molecular resist shows higher sensitivity of 3 mJ/cm2 than the polymer resist of 4 mJ/cm2. The deprotection mechanism was approximated by simple reaction equations and Fourier-transform infrared spectra was interpreted to give the products of a quantum yield and a deprotection rate constant as 9.7×10-8 and 8.1×10-8 cm3 molecule-1 s-1 for molecular and polymer resists. The higher sensitivity of the molecular resist is due to the larger efficiency of the reaction mechanism.

  11. Scanning X-Ray Or Extreme-Ultraviolet Monochromator

    NASA Technical Reports Server (NTRS)

    Hoover, Richard

    1991-01-01

    Wavelength of peak transmission of proposed high-throughput, narrow-band-pass x-ray or extreme-ultraviolet monochromator continuously adjustable. Essential filtering and reflecting components designed according to principles described in "Compact X-Ray and Extreme-Ultraviolet Monochromator" (MFS-28499). However, angle of incidence varied to change wavelength of Bragg reflection.

  12. Extreme ultraviolet spectral irradiance measurements since 1946

    NASA Astrophysics Data System (ADS)

    Schmidtke, G.

    2015-03-01

    In the physics of the upper atmosphere the solar extreme ultraviolet (EUV) radiation plays a dominant role controlling most of the thermospheric/ionospheric (T/I) processes. Since this part of the solar spectrum is absorbed in the thermosphere, platforms to measure the EUV fluxes became only available with the development of rockets reaching altitude levels exceeding 80 km. With the availability of V2 rockets used in space research, recording of EUV spectra started in 1946 using photographic films. The development of pointing devices to accurately orient the spectrographs toward the sun initiated intense activities in solar-terrestrial research. The application of photoelectric recording technology enabled the scientists placing EUV spectrometers aboard satellites observing qualitatively strong variability of the solar EUV irradiance on short-, medium-, and long-term scales. However, as more measurements were performed more radiometric EUV data diverged due to the inherent degradation of the EUV instruments with time. Also, continuous recording of the EUV energy input to the T/I system was not achieved. It is only at the end of the last century that there was progress made in solving the serious problem of degradation enabling to monitore solar EUV fluxes with sufficient radiometric accuracy. The data sets available allow composing the data available to the first set of EUV data covering a period of 11 years for the first time. Based on the sophisticated instrumentation verified in space, future EUV measurements of the solar spectral irradiance (SSI) are promising accuracy levels of about 5% and less. With added low-cost equipment, real-time measurements will allow providing data needed in ionospheric modeling, e.g., for correcting propagation delays of navigation signals from space to earth. Adding EUV airglow and auroral emission monitoring by airglow cameras, the impact of space weather on the terrestrial T/I system can be studied with a spectral terrestrial

  13. High intensity vacuum ultraviolet and extreme ultraviolet production by noncollinear mixing in laser vaporized media

    NASA Astrophysics Data System (ADS)

    Todt, Michael A.; Albert, Daniel R.; Davis, H. Floyd

    2016-06-01

    A method is described for generating intense pulsed vacuum ultraviolet (VUV) and extreme ultraviolet (XUV) laser radiation by resonance enhanced four-wave mixing of commercial pulsed nanosecond lasers in laser vaporized mercury under windowless conditions. By employing noncollinear mixing of the input beams, the need of dispersive elements such as gratings for separating the VUV/XUV from the residual UV and visible beams is eliminated. A number of schemes are described, facilitating access to the 9.9-14.6 eV range. A simple and convenient scheme for generating wavelengths of 125 nm, 112 nm, and 104 nm (10 eV, 11 eV, and 12 eV) using two dye lasers without the need for dye changes is described.

  14. Absolute dosimetry for extreme-ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Berger, Kurt W.; Campiotti, Richard H.

    2000-06-01

    The accurate measurement of an exposure dose reaching the wafer on an extreme ultraviolet (EUV) lithographic system has been a technical challenge directly applicable to the evaluation of candidate EUV resist materials and calculating lithography system throughputs. We have developed a dose monitoring sensor system that can directly measure EUV intensities at the wafer plane of a prototype EUV lithographic system. This sensor system, located on the wafer stage adjacent to the electrostatic chuck used to grip wafers, operates by translating the sensor into the aerial image, typically illuminating an 'open' (unpatterned) area on the reticle. The absolute signal strength can be related to energy density at the wafer, and thus used to determine resist sensitivity, and the signal as a function of position can be used to determine illumination uniformity at the wafer plane. Spectral filtering to enhance the detection of 13.4 nm radiation was incorporated into the sensor. Other critical design parameters include the packaging and amplification technologies required to place this device into the space and vacuum constraints of a EUV lithography environment. We describe two approaches used to determine the absolute calibration of this sensor. The first conventional approach requires separate characterization of each element of the sensor. A second novel approach uses x-ray emission from a mildly radioactive iron source to calibrate the absolute response of the entire sensor system (detector and electronics) in a single measurement.

  15. Initial results from the extreme ultraviolet explorer

    NASA Technical Reports Server (NTRS)

    Bowyer, S.; Malina, R. F.

    1993-01-01

    Data obtained during the first five months of calibration and science operation of the Extreme Ultraviolet Explorer (EUVE) are presented. Spectra of an extragalactic object were obtained; the object is detectable to wavelenghts longer than 100 A, demonstrating that extragalactic EUV astronomy is possible. Spectra of a hot white dwarf, and a late-type star in quiescence and flaring are shown as examples of the type of spectrographic data obtainable with EUVE. Other objects for which broad band photometric mode data have been obtained and analyzed include an RS CVn star and several late-type stars. The backgrounds in the EUVE detectors are quite low and the character of the diffuse astronomical EUV background has been investigated using these very low rates. Evidence is presented showing that, contrary to previously published reports, EUVE is about three times more sensitive than the English Wide Field Camera in the short wavelength bandpass covered by both instruments. Only limited information has been extracted from the longer bandpasses coered only by EUVE. Nonetheless, the brightest EUV source in the sky, a B star, has been discovered and is detected only in these longer bandpasses.

  16. Reflective masks for extreme ultraviolet lithography

    SciTech Connect

    Nguyen, Khanh Bao

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 {mu}m wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  17. STEREO's Extreme UltraViolet Imager (EUVI)

    NASA Technical Reports Server (NTRS)

    2007-01-01

    At a pixel resolution of 2048x2048, the STEREO EUVI instrument provides views of the Sun in ultraviolet light that rivals the full-disk views of SOHO/EIT. This image is through the 171 Angstrom (ultraviolet) filter which is characteristic of iron ions (missing eight and nine electrons) at 1 million degrees. There is a short data gap in the latter half of the movie that creates a freeze and then jump in the data view. This is a movie of the Sun in 171 Angstrom ultraviolet light. The time frame is late January, 2007

  18. Extreme ultraviolet transmission of a synthetic diamond thin film

    NASA Technical Reports Server (NTRS)

    Vallerga, John V.; Gibson, J. L.; Knowles, J. L.

    1991-01-01

    Measurements are presented of a thin film of synthetic diamond at various wavelengths in the extreme ultraviolet. The synthetic diamond combines the transmission properties of carbon with the strength, density, and ruggedness of a natural diamond. The Extreme Ultraviolet Transmission (EUV) of a film of the synthetic diamond has shown the existence of a thin surface layer of silicon, probably in the form of silicon carbide, which is not a contaminant layer.

  19. Sensitivity calibration of an imaging extreme ultraviolet spectrometer-detector system for determining the efficiency of broadband extreme ultraviolet sources

    SciTech Connect

    Fuchs, S.; Roedel, C.; Bierbach, J.; Paz, A. E.; Foerster, E.; Paulus, G. G.; Krebs, M.; Haedrich, S.; Limpert, J.; Kuschel, S.; Wuensche, M.; Hilbert, V.; Zastrau, U.

    2013-02-15

    We report on the absolute sensitivity calibration of an extreme ultraviolet (XUV) spectrometer system that is frequently employed to study emission from short-pulse laser experiments. The XUV spectrometer, consisting of a toroidal mirror and a transmission grating, was characterized at a synchrotron source in respect of the ratio of the detected to the incident photon flux at photon energies ranging from 15.5 eV to 99 eV. The absolute calibration allows the determination of the XUV photon number emitted by laser-based XUV sources, e.g., high-harmonic generation from plasma surfaces or in gaseous media. We have demonstrated high-harmonic generation in gases and plasma surfaces providing 2.3 {mu}W and {mu}J per harmonic using the respective generation mechanisms.

  20. Sub-50nm extreme ultraviolet holographic imaging

    NASA Astrophysics Data System (ADS)

    Wachulak, P. W.; Marconi, M. C.; Bartels, R. A.; Menoni, C. S.; Rocca, J. J.

    2009-05-01

    Imaging tools for nanoscicence involving sub-100-nm scale objects have been dominated by atomic force microscopy (AFM), scanning tunneling microscopy (STM), and electron microscopy (SEM, TEM). These imaging techniques have contributed substantially to the development of nanoscience, providing a very powerful diagnostic tool capable of obtaining images with atomic resolution or as a subsidiary mechanism to arrange or modify surfaces also at the atomic scale [1,2]. However, some important problems have persisted traditional nanoscale imaging techniques. For example when scanning a nanometer size object that is not attached rigidly to a surface the interaction with the tip significantly perturbs the specimen degrading or eventually precluding the image acquisition. Electron microscopy often requires surface preparation, consisting of metallization of the sample to avoid surface charging. Additionally the metallization of the sample may alter its characteristics and also limits the resolution. In both cases, if the sample is large (millimeters in size) due to the limited field of view, the image obtained with these conventional methods is only representative of a very small portion of the object. Wavelength-limited holographic imaging using carbon nanotubes as the test object with a table-top extreme ultraviolet (EUV) laser operating at 46.9 nm will be discussed. The resolution achieved in this imaging is evaluated with a rigorous correlation image analysis and confirmed with the conventional knife-edge test. The nano-holography presented requires no optics or critical beam alignment; thus the hologram recording scheme is very simple and does not need special sample preparation. In holography, image contrast requires absorption to provide scattering by the illuminating beam. The EUV laser wavelength employed in this experiment (46.9nm) is advantageous because carbon based materials typically exhibit very small attenuation lengths, around 25 nm. The high absorption of

  1. Ultrafast Extreme Ultraviolet Induced Isomerization of Acetylene Cations

    SciTech Connect

    Jiang, Y.; Rudenko, Artem; Herrwerth, O.; Foucar, L.; Kurka, M.; Kuhnel, K.; Lezius, M.; Kling, Matthias; van Tilborg, Jeroen; Belkacem, Ali; Ueda, K.; Dusterer, S.; Treusch, R.; Schroter, Claus-Dieter; Moshammer, Robbert; Ullrich, Joachim

    2011-06-17

    Ultrafast isomerization of acetylene cations ([HC = CH]{sup +}) in the low-lying excited A{sup 2}{Sigma}{sub g}{sup +} state, populated by the absorption of extreme ultraviolet (XUV) photons (38 eV), has been observed at the Free Electron Laser in Hamburg, (FLASH). Recording coincident fragments C{sup +} + CH{sub 2}{sup +} as a function of time between XUV-pump and -probe pulses, generated by a split-mirror device, we find an isomerization time of 52 {+-} 15 fs in a kinetic energy release (KER) window of 5.8 < KER < 8 eV, providing clear evidence for the existence of a fast, nonradiative decay channel.

  2. Ultrafast Extreme Ultraviolet Induced Isomerization of Acetylene Cations

    SciTech Connect

    Jiang, Y. H.; Kurka, M.; Kuehnel, K. U.; Schroeter, C. D.; Moshammer, R.; Rudenko, A.; Foucar, L.; Herrwerth, O.; Lezius, M.; Kling, M. F.; Tilborg, J. van; Belkacem, A.; Ueda, K.; Duesterer, S.; Treusch, R.; Ullrich, J.

    2010-12-31

    Ultrafast isomerization of acetylene cations ([HC=CH]{sup +}) in the low-lying excited A{sup 2}{Sigma}{sub g}{sup +} state, populated by the absorption of extreme ultraviolet (XUV) photons (38 eV), has been observed at the Free Electron Laser in Hamburg, (FLASH). Recording coincident fragments C{sup +}+CH{sub 2}{sup +} as a function of time between XUV-pump and -probe pulses, generated by a split-mirror device, we find an isomerization time of 52{+-}15 fs in a kinetic energy release (KER) window of 5.8

  3. Nanometer scale imaging with table top extreme ultraviolet sources

    NASA Astrophysics Data System (ADS)

    Wachulak, Przemyslaw W.; Sandberg, Richard L.; Isoyan, Artak; Urbanski, Lukasz; Bartnik, Andrzej; Bartels, Randy A.; Menoni, Carmen S.; Fiedorowicz, Henryk; Rocca, Jorge J.; Marconi, Mario C.

    2010-12-01

    Decreasing the illumination wavelength allows to improve the spatial resolution in photon-based imaging systems and enables a nanometer-scale spatial resolution. Due to a significant interest in nanometer-scale spatial resolution imaging short wavelengths from extreme ultraviolet (EUV) region are often used. A few examples of various imaging techniques, such as holography, zone plate EUV microscopy, computer generated hologram EUV reconstruction, lens-less diffraction imaging and generalized Talbot self-imaging will be presented utilizing coherent and incoherent EUV sources. Some of these EUV imaging techniques lead to the high spatial resolution, better than 50nm in a very short exposure time. The techniques, presented herein, have potential to be used in actinic mask inspection for EUV lithography, mask-less lithographic processes in the nanofabrication, in material science or biology.

  4. Ptychographic hyperspectral spectromicroscopy with an extreme ultraviolet high harmonic comb.

    PubMed

    Zhang, Bosheng; Gardner, Dennis F; Seaberg, Matthew H; Shanblatt, Elisabeth R; Porter, Christina L; Karl, Robert; Mancuso, Christopher A; Kapteyn, Henry C; Murnane, Margaret M; Adams, Daniel E

    2016-08-01

    We report a proof-of-principle demonstration of a new scheme of spectromicroscopy in the extreme ultraviolet (EUV) spectral range, where the spectral response of the sample at different wavelengths is imaged simultaneously. This scheme is enabled by combining ptychographic information multiplexing (PIM) with a tabletop EUV source based on high harmonic generation, where four spectrally narrow harmonics near 30 nm form a spectral comb structure. Extending PIM from previously demonstrated visible wavelengths to the EUV/X-ray wavelengths promises much higher spatial resolution and a more powerful spectral contrast mechanism, making PIM an attractive spectromicroscopy method in both microscopy and spectroscopy aspects. In addition to spectromicroscopy, this method images the multicolor EUV beam in situ, making this a powerful beam characterization technique. In contrast to other methods, the techniques described here use no hardware to separate wavelengths, leading to efficient use of the EUV radiation. PMID:27505837

  5. Comparing Vacuum and Extreme Ultraviolet Radiation for Postionization of Laser Desorbed Neutrals from Bacterial Biofilms and Organic Fullerene

    SciTech Connect

    Gaspera, Gerald L.; Takahashi, Lynelle K.; Zhou, Jia; Ahmed, Musahid; Moored, Jerry F.; Hanley, Luke

    2010-12-08

    Vacuum and extreme ultraviolet radiation from 8 - 24 eV generated at a synchrotron was used to postionize laser desorbed neutrals of antibiotic-treated biofilms and a modified fullerene using laser desorption postionization mass spectrometry (LDPI-MS). Results show detection of the parent ion, various fragments, and extracellular material from biofilms using LDPI-MS with both vacuum and extreme ultraviolet photons. Parent ions were observed for both cases, but extreme ultraviolet photons (16-24 eV) induced more fragmentation than vacuum ultraviolet (8-14 eV) photons.

  6. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography

    PubMed Central

    Tarrio, Charles; Grantham, Steven; Squires, Matthew B.; Vest, Robert E.; Lucatorto, Thomas B.

    2003-01-01

    Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.12 %. We report on two upgrades of our NIST/DARPA Reflectometry Facility that have given us the ability to achieve 0.1 % repeatability and 0.3 % absolute uncertainty in our reflectivity measurements. A third upgrade, a monochromator with thermal and mechanical stability for improved wavelength repeatability, is currently in the design phase.

  7. Low-defect reflective mask blanks for extreme ultraviolet lithography

    SciTech Connect

    Burkhart, S C; Cerjarn, C; Kearney, P; Mirkarimi, P; Walton, C; Ray-Chaudhuri, A

    1999-03-11

    Extreme Ultraviolet Lithgraphy (EUVL) is an emerging technology for fabrication of sub-100 nm feature sizes on silicon, following the SIA roadmap well into the 21st century. The specific EUVL system described is a scanned, projection lithography system with a 4:1 reduction, using a laser plasma EUV source. The mask and all of the system optics are reflective, multilayer mirrors which function in the extreme ultraviolet at 13.4 nm wavelength. Since the masks are imaged to the wafer exposure plane, mask defects greater than 80% of the exposure plane CD (for 4:1 reduction) will in many cases render the mask useless, whereas intervening optics can have defects which are not a printing problem. For the 100 nm node, we must reduce defects to less than 0.01/cm² @ 80nm or larger to obtain acceptable mask production yields. We have succeeded in reducing the defects to less than 0.1/cm² for defects larger than 130 nm detected by visible light inspection tools, however our program goal is to achieve 0.01/cm² in the near future. More importantly though, we plan to have a detailed understanding of defect origination and the effect on multilayer growth in order to mitigate defects below the 10-2/cm² level on the next generation of mask blank deposition systems. In this paper we will discuss issues and results from the ion-beam multilayer deposition tool, details of the defect detection and characterization facility, and progress on defect printability modeling.

  8. Four-wave mixing experiments with extreme ultraviolet transient gratings

    NASA Astrophysics Data System (ADS)

    Bencivenga, F.; Cucini, R.; Capotondi, F.; Battistoni, A.; Mincigrucci, R.; Giangrisostomi, E.; Gessini, A.; Manfredda, M.; Nikolov, I. P.; Pedersoli, E.; Principi, E.; Svetina, C.; Parisse, P.; Casolari, F.; Danailov, M. B.; Kiskinova, M.; Masciovecchio, C.

    2015-04-01

    Four-wave mixing (FWM) processes, based on third-order nonlinear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enable the exploration of dynamics inaccessible by linear methods. The coherent and multi-wave nature of the FWM approach has been crucial in the development of advanced technologies, such as silicon photonics, subwavelength imaging and quantum communications. All these technologies operate at optical wavelengths, which limits the spatial resolution and does not allow the probing of excitations with energy in the electronvolt range. Extension to shorter wavelengths--that is, the extreme ultraviolet and soft-X-ray ranges--would allow the spatial resolution to be improved and the excitation energy range to be expanded, as well as enabling elemental selectivity to be achieved by exploiting core resonances. So far, FWM applications at such wavelengths have been prevented by the absence of coherent sources of sufficient brightness and of suitable experimental set-ups. Here we show how transient gratings, generated by the interference of coherent extreme-ultraviolet pulses delivered by the FERMI free-electron laser, can be used to stimulate FWM processes at suboptical wavelengths. Furthermore, we have demonstrated the possibility of observing the time evolution of the FWM signal, which shows the dynamics of coherent excitations as molecular vibrations. This result opens the way to FWM with nanometre spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics. The theoretical possibility of realizing these applications has already stimulated ongoing developments of free-electron lasers: our results show that FWM at suboptical wavelengths is feasible, and we hope that they will enable advances in present and future photon sources.

  9. The Extreme Ultraviolet Explorer mission - Overview and initial results

    NASA Technical Reports Server (NTRS)

    Haisch, B.; Bowyer, S.; Malina, R. F.

    1993-01-01

    The history of extreme ultraviolet (EUV) astronomy is briefly reviewed, and an overview of the Extreme Ultraviolet Explorer mission, launched into a near-earth (550 km) orbit on June 7, 1992, is presented. First, the principal objective of the mission are summarized. The instrumentation and operation of the mission are then described, with particular attention given to the sky survey instruments, the deep survey instrument, and the spectrometers. The discussion also covers the current view of the interstellar medium, early results from the mission, and future prospects for EUV astronomy.

  10. 'EXTREME ULTRAVIOLET WAVES' ARE WAVES: FIRST QUADRATURE OBSERVATIONS OF AN EXTREME ULTRAVIOLET WAVE FROM STEREO

    SciTech Connect

    Patsourakos, Spiros; Vourlidas, Angelos E-mail: vourlidas@nrl.navy.mil

    2009-08-01

    The nature of coronal mass ejection (CME)-associated low corona propagating disturbances, 'extreme ultraviolet (EUV) waves', has been controversial since their discovery by EIT on SOHO. The low-cadence, single-viewpoint EUV images and the lack of simultaneous inner corona white-light observations have hindered the resolution of the debate on whether they are true waves or just projections of the expanding CME. The operation of the twin EUV imagers and inner corona coronagraphs aboard STEREO has improved the situation dramatically. During early 2009, the STEREO Ahead (STA) and Behind (STB) spacecrafts observed the Sun in quadrature having a {approx}90 deg. angular separation. An EUV wave and CME erupted from active region 11012, on February 13, when the region was exactly at the limb for STA and hence at disk center for STB. The STEREO observations capture the development of a CME and its accompanying EUV wave not only with high cadence but also in quadrature. The resulting unprecedented data set allowed us to separate the CME structures from the EUV wave signatures and to determine without doubt the true nature of the wave. It is a fast-mode MHD wave after all.

  11. Photoemission electron microscopy using extreme ultraviolet attosecond pulse trains

    SciTech Connect

    Mikkelsen, A.; Schwenke, J.; Fordell, T.; Luo, G.; Kluender, K.; Hilner, E.; Anttu, N.; Lundgren, E.; Mauritsson, J.; Andersen, J. N.; Xu, H. Q.; L'Huillier, A.; Zakharov, A. A.

    2009-12-15

    We report the first experiments carried out on a new imaging setup, which combines the high spatial resolution of a photoemission electron microscope (PEEM) with the temporal resolution of extreme ultraviolet (XUV) attosecond pulse trains. The very short pulses were provided by high-harmonic generation and used to illuminate lithographic structures and Au nanoparticles, which, in turn, were imaged with a PEEM resolving features below 300 nm. We argue that the spatial resolution is limited by the lack of electron energy filtering in this particular demonstration experiment. Problems with extensive space charge effects, which can occur due to the low probe pulse repetition rate and extremely short duration, are solved by reducing peak intensity while maintaining a sufficient average intensity to allow imaging. Finally, a powerful femtosecond infrared (IR) beam was combined with the XUV beam in a pump-probe setup where delays could be varied from subfemtoseconds to picoseconds. The IR pump beam could induce multiphoton electron emission in resonant features on the surface. The interaction between the electrons emitted by the pump and probe pulses could be observed.

  12. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1987-01-01

    Analysis and interpretation continued on data generated by the flight of 27.086 in April of 1986 and by the successful UVX mission. Optical and mechanical design of the 1 meter EUV telescope, planned for launch with the large SPARTAN type carrier, ASTRO-SPAS, was also continued. The major effort centered on the preparation of flight 27.106, scheduled to launch in September, 1986. Work which was performed included: design of the skins and bulkheads; completion of the optical, mechanical, and electrical design; purchase of the major components of the instruments; assemblage of the electrical components; and performance of theoretical work, to support the data interpretation.

  13. Extreme ultraviolet high-harmonic spectroscopy of solids

    NASA Astrophysics Data System (ADS)

    Luu, T. T.; Garg, M.; Kruchinin, S. Yu.; Moulet, A.; Hassan, M. Th.; Goulielmakis, E.

    2015-05-01

    Extreme ultraviolet (EUV) high-harmonic radiation emerging from laser-driven atoms, molecules or plasmas underlies powerful attosecond spectroscopy techniques and provides insight into fundamental structural and dynamic properties of matter. The advancement of these spectroscopy techniques to study strong-field electron dynamics in condensed matter calls for the generation and manipulation of EUV radiation in bulk solids, but this capability has remained beyond the reach of optical sciences. Recent experiments and theoretical predictions paved the way to strong-field physics in solids by demonstrating the generation and optical control of deep ultraviolet radiation in bulk semiconductors, driven by femtosecond mid-infrared fields or the coherent up-conversion of terahertz fields to multi-octave spectra in the mid-infrared and optical frequencies. Here we demonstrate that thin films of SiO2 exposed to intense, few-cycle to sub-cycle pulses give rise to wideband coherent EUV radiation extending in energy to about 40 electronvolts. Our study indicates the association of the emitted EUV radiation with intraband currents of multi-petahertz frequency, induced in the lowest conduction band of SiO2. To demonstrate the applicability of high-harmonic spectroscopy to solids, we exploit the EUV spectra to gain access to fine details of the energy dispersion profile of the conduction band that are as yet inaccessible by photoemission spectroscopy in wide-bandgap dielectrics. In addition, we use the EUV spectra to trace the attosecond control of the intraband electron motion induced by synthesized optical transients. Our work advances lightwave electronics in condensed matter into the realm of multi-petahertz frequencies and their attosecond control, and marks the advent of solid-state EUV photonics.

  14. Advantages of a Grazing Incidence Monochromator in the Extreme Ultraviolet

    NASA Astrophysics Data System (ADS)

    Barton, Sarah; Turley, R. Steven

    2006-10-01

    One of the main goals of the BYU Thin Films group is to find optical constants for materials in the Extreme Ultraviolet. This is accomplished by taking reflection and transmission measurements. The addition of a Grazing Incidence Monochromator to our current system allows us to take reflectance measurements at wavelengths currently unavailable on the Normal Incidence Monochromator (Monarch).

  15. Extreme ultraviolet lithography mask etch study and overview

    NASA Astrophysics Data System (ADS)

    Wu, Banqiu; Kumar, Ajay; Chandrachood, Madhavi; Sabharwal, Amitabh

    2013-04-01

    An overview of extreme ultraviolet lithography (EUVL) mask etch is presented and a EUVL mask etch study was carried out. Today, EUVL implementation has three critical challenges that hinder its adoption: extreme ultraviolet (EUV) source power, resist resolution-line width roughness-sensitivity, and a qualified EUVL mask. The EUVL mask defect challenges result from defects generated during blank preparation, absorber and multilayer deposition processes, as well as patterning, etching and wet clean processes. Stringent control on several performance criteria including critical dimension (CD) uniformity, etch bias, micro-loading, profile control, defect control, and high etch selectivity requirement to capping layer is required during the resist pattern duplication on the underlying absorber layer. EUVL mask absorbers comprise of mainly tantalum-based materials rather than chrome- or MoSi-based materials used in standard optical masks. Compared to the conventional chrome-based absorbers and phase shift materials, tantalum-based absorbers need high ion energy to obtain moderate etch rates. However, high ion energy may lower resist selectivity, and could introduce defects. Current EUVL mask consists of an anti-reflective layer on top of the bulk absorber. Recent studies indicate that a native oxide layer would suffice as an anti-reflective coating layer during the electron beam inspection. The absorber thickness and the material properties are optimized based on optical density targets for the mask as well as electromagnetic field effects and optics requirements of the patterning tools. EUVL mask etch processes are modified according to the structure of the absorber, its material, and thickness. However, etch product volatility is the fundamental requirement. Overlapping lithographic exposure near chip border may require etching through the multilayer, resulting in challenges in profile control and etch selectivity. Optical proximity correction is applied to further

  16. Method for plasma formation for extreme ultraviolet lithography-theta pinch

    DOEpatents

    Hassanein, Ahmed; Konkashbaev, Isak; Rice, Bryan

    2007-02-20

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range; a collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation; and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.

  17. Multilayer reflective coatings for extreme-ultraviolet lithography

    SciTech Connect

    Montcalm, C., LLNL

    1998-03-10

    Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system.

  18. Amorphous silicon carbide coatings for extreme ultraviolet optics

    NASA Technical Reports Server (NTRS)

    Kortright, J. B.; Windt, David L.

    1988-01-01

    Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 A were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.

  19. EXCEED: an extreme ultraviolet spectrometer onboard SPRINT-A

    NASA Astrophysics Data System (ADS)

    Murakami, Go; Yoshioka, Kazuo; Yamazaki, Atsushi; Uemizu, Kazunori; Ishii, Hiroaki; Uji, Kentaro; Yoshikawa, Ichiro; Kagitani, Masato; Tsuchiya, Fuminori

    2012-09-01

    The extreme ultraviolet (EUV) telescope EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) onboard the Japan's small satellite SPRINT-A will be launched in August 2013. The EXCEED instrument will observe tenuous gases and plasmas around the planets in the solar system (e.g., Mercury, Venus, Mars, Jupiter, and Saturn). The EXCEED instrument is designed to have a spectral range of 60-145 nm with a spectral resolution of 0.4-1.0 nm. The instrument has a field of view of 400” x 140” (maximum), and the attitude fluctuations are stabilized within +/-5". The optics of the instrument consists of an entrance mirror with a diameter of 200 mm, three types of slits, two types of filters, a laminar type grating, and a 5-stage microchannel plate assembly with a resistive anode encoder. In this paper, we report the general mission overview, the instrumentations, and the results of ground calibrations.

  20. Metrology of 13-nm optics for extreme ultraviolet lithography

    SciTech Connect

    Beckwith, J.F.; Patterson, S.R.; Thompson, D.C.; Badami, V.; Smith, S.

    1997-02-03

    This report documents activities carried in support of the design and construction of an ultra-high precision measuring machine intended for the support of Extreme Ultraviolet Lithography development (for semiconductor fabrication). At the outset, this project was aimed at the overall fabrication of such a measuring machine. Shortly after initiation, however, the scope of activities was reduced and effort was concentrated on the key technical advances necessary to support such machine development: high accuracy surface sensing and highly linear distance interferometry.

  1. Grating configurations to compress extreme-ultraviolet ultrashort pulses.

    PubMed

    Frassetto, Fabio; Poletto, Luca

    2015-09-10

    It is here discussed the design of ultrafast extreme-ultraviolet (XUV) grating compressors that can be used to condition the spectral phase of ultrashort chirped pulses to compensate for the phase chirp and get closer to the Fourier limit. We discuss the two configurations that can be used to realize the compressor, the classical diffraction mount, and the off-plane one. The concept is applied to the realization of a XUV compressor with applications to free-electron lasers. PMID:26368974

  2. Ultraviolet and extreme ultraviolet spectroscopy of the solar corona at the Naval Research Laboratory.

    PubMed

    Moses, J D; Ko, Y-K; Laming, J M; Provornikova, E A; Strachan, L; Beltran, S Tun

    2015-11-01

    We review the history of ultraviolet and extreme ultraviolet spectroscopy with a specific focus on such activities at the Naval Research Laboratory and on studies of the extended solar corona and solar-wind source regions. We describe the problem of forecasting solar energetic particle events and discuss an observational technique designed to solve this problem by detecting supra-thermal seed particles as extended wings on spectral lines. Such seed particles are believed to be a necessary prerequisite for particle acceleration by heliospheric shock waves driven by a coronal mass ejection. PMID:26560611

  3. Silicon Lightweight Mirrors (SLMS) for Ultraviolet and Extreme Ultraviolet Imaging Mirrors

    NASA Technical Reports Server (NTRS)

    Goodman, W. A.; Keys, Andrew S. (Technical Monitor)

    2002-01-01

    Subtopic 01-S1.06 requires mirrors with a diameter of 0.5-2.4 meters, areal density less than 20 kg/sq m, a figure specification of 0.02-0.005 waves root mean square (rms) at 633 nanometers, a surface roughness 0.5-1 nanometers rms, and a midfrequency error of 1.0-2.5 nanometers rms for use in the infrared (IR) to extreme ultra violet (EUV) waveband. Schafer's Phase II objective is to use Silicon Lightweight Mirrors (SLMS), a novel, all-silicon, foam-core, lightweight mirror technology, to build three imaging mirrors for the Next Generation Space Telescope Near Infrared Camera (NIRCam) Engineering Test Unit: M0 (a flat), M2 (a concave sphere) and M3R (an oblate spheroid). The surface figure error specification for the NIRCam imaging mirrors is 8 nanometers rms (0.013 waves rms at 633 nanometers), equivalent to that required for ultraviolet (UV) and EUV mirrors, and this figure must be maintained at the 35 K operational temperature of NGST. The surface roughness required is 30 A rms since NIRCam operates in the visible to infrared (VIS/IR) (0.65-5 microns). We will produce mounts for mirrors M2 and M3R using the complementary thermally matched C/SiC material demonstrated by Schafer under another NASA SBIR, NAS8-98137.

  4. Extreme Ultraviolet Explorer. Long look at the next window

    NASA Technical Reports Server (NTRS)

    Maran, Stephen P.

    1991-01-01

    The Extreme Ultraviolet Explorer (EUVE) will map the entire sky to determine the existence, direction, brightness, and temperature of thousands of objects that are sources of so-called extreme ultraviolet (EUV) radiation. The EUV spectral region is located between the x-ray and ultraviolet regions of the electromagnetic spectrum. From the sky survey by EUVE, astronomers will determine the nature of sources of EUV light in our galaxy, and infer the distribution of interstellar gas for hundreds of light years around the solar system. It is from this gas and the accompanying dust in space that new stars and solar systems are born and to which evolving and dying stars return much of their material in an endless cosmic cycle of birth, death, and rebirth. Besides surveying the sky, astronomers will make detailed studies of selected objects with EUVE to determine their physical properties and chemical compositions. Also, they will learn about the conditions that prevail and the processes at work in stars, planets, and other sources of EUV radiation, maybe even quasars. The EUVE mission and instruments are described. The objects that EUVE will likely find are described.

  5. Relativistic frequency upshift to the extreme ultraviolet regime using self-induced oscillatory flying mirrors.

    PubMed

    Kim, I Jong; Pae, Ki Hong; Kim, Chul Min; Kim, Hyung Taek; Yun, Hyeok; Yun, Sang Jae; Sung, Jae Hee; Lee, Seong Ku; Yoon, Jin Woo; Yu, Tae Jun; Jeong, Tae Moon; Nam, Chang Hee; Lee, Jongmin

    2012-01-01

    Coherent short-wavelength radiation from laser-plasma interactions is of increasing interest in disciplines including ultrafast biomolecular imaging and attosecond physics. Using solid targets instead of atomic gases could enable the generation of coherent extreme ultraviolet radiation with higher energy and more energetic photons. Here we present the generation of extreme ultraviolet radiation through coherent high-harmonic generation from self-induced oscillatory flying mirrors--a new-generation mechanism established in a long underdense plasma on a solid target. Using a 30-fs, 100-TW Ti:sapphire laser, we obtain wavelengths as short as 4.9 nm for an optimized level of amplified spontaneous emission. Particle-in-cell simulations show that oscillatory flying electron nanosheets form in a long underdense plasma, and suggest that the high-harmonic generation is caused by reflection of the laser pulse from electron nanosheets. We expect this extreme ultraviolet radiation to be valuable in realizing a compact X-ray instrument for research in biomolecular imaging and attosecond physics. PMID:23187631

  6. Relativistic frequency upshift to the extreme ultraviolet regime using self-induced oscillatory flying mirrors

    PubMed Central

    Kim, I Jong; Pae, Ki Hong; Kim, Chul Min; Kim, Hyung Taek; Yun, Hyeok; Yun, Sang Jae; Sung, Jae Hee; Lee, Seong Ku; Yoon, Jin Woo; Yu, Tae Jun; Jeong, Tae Moon; Nam, Chang Hee; Lee, Jongmin

    2012-01-01

    Coherent short-wavelength radiation from laser–plasma interactions is of increasing interest in disciplines including ultrafast biomolecular imaging and attosecond physics. Using solid targets instead of atomic gases could enable the generation of coherent extreme ultraviolet radiation with higher energy and more energetic photons. Here we present the generation of extreme ultraviolet radiation through coherent high-harmonic generation from self-induced oscillatory flying mirrors—a new-generation mechanism established in a long underdense plasma on a solid target. Using a 30-fs, 100-TW Ti:sapphire laser, we obtain wavelengths as short as 4.9 nm for an optimized level of amplified spontaneous emission. Particle-in-cell simulations show that oscillatory flying electron nanosheets form in a long underdense plasma, and suggest that the high-harmonic generation is caused by reflection of the laser pulse from electron nanosheets. We expect this extreme ultraviolet radiation to be valuable in realizing a compact X-ray instrument for research in biomolecular imaging and attosecond physics. PMID:23187631

  7. Line image sensors for spectroscopic applications in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Banyay, Matus; Brose, Sascha; Juschkin, Larissa

    2009-10-01

    The spectral range of extreme ultraviolet radiation (XUV or EUV) is an active area of research incorporating many scientific fields such as microscopy, lithography or reflectometry. During the last decade, a lot of effort has been put into transferring many of the known techniques developed at linear accelerators into the laboratory using discharge-produced plasmas (DPPs) or laser-produced plasmas (LPPs) as an alternative light source. In particular, the semiconductor industry is in need of on-site tools in the shorter wavelength range for production and inspection of structured surfaces with nanometer resolution. Here traditional charge coupled device (CCD) image sensors are inapplicable as detectors because of the strong absorption of XUV by matter prohibiting any generation of electron-hole pairs inside a deep lying p-n junction. As a solution, two-dimensional backthinned CCDs are available in the market offering high sensitivity to XUV light. Although for many applications a one-dimensional line scanning image sensor would be sufficient, they are non-existent for XUV. It is only lately that manufacturers have started to adopt the principle of backthinning to CCD line sensors to enhance sensitivity in the long wavelength UV range (>200 nm). Here we show that generally these compact sensors offer good quantum efficiencies in the XUV which make them a candidate for many spectroscopic applications and future industrial inline inspection tools for which costly two-dimensional CCDs are oversized. We have successfully implemented a compact sensor device into a laboratory XUV spectrometer and reflectometer. Our measurements compare the quantum efficiency of a state-of-the-art XUV array CCD to a phosphor-coated line sensor and a new backthinned line sensor. Additionally, we show recorded spectra from a laboratory DPP source to demonstrate the potential of a wide range of applications.

  8. Four wave mixing experiments with extreme ultraviolet transient gratings

    PubMed Central

    Bencivenga, F.; Cucini, R.; Capotondi, F.; Battistoni, A.; Mincigrucci, R.; Giangrisostomi, E.; Gessini, A.; Manfredda, M.; Nikolov, I. P.; Pedersoli, E.; Principi, E.; Svetina, C.; Parisse, P.; Casolari, F.; Danailov, M. B.; Kiskinova, M.; Masciovecchio, C.

    2015-01-01

    Four wave mixing (FWM) processes, based on third-order non-linear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enables to explore dynamics inaccessible by linear methods.1-7 The coherent and multi-wave nature of FWM approach has been crucial in the development of cutting edge technologies, such as silicon photonics,8 sub-wavelength imaging9 and quantum communications.10 All these technologies operate with optical wavelengths, which limit the spatial resolution and do not allow probing excitations with energy in the eV range. The extension to shorter wavelengths, that is the extreme ultraviolet (EUV) and soft-x-ray (SXR) range, will allow to improve the spatial resolution and to expand the excitation energy range, as well as to achieve elemental selectivity by exploiting core resonances.5-7,11-14 So far FWM applications at these wavelengths have been prevented by the absence of coherent sources of sufficient brightness and suitable experimental setups. Our results show how transient gratings, generated by the interference of coherent EUV pulses delivered by the FERMI free electron laser (FEL),15 can be used to stimulate FWM processes at sub-optical wavelengths. Furthermore, we have demonstrated the possibility to read the time evolution of the FWM signal, which embodies the dynamics of coherent excitations as molecular vibrations. This result opens the perspective for FWM with nanometer spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics.5-7 The theoretical possibility to realize these applications have already stimulated dedicated and ongoing FEL developments;16-20 today our results show that FWM at sub-optical wavelengths is feasible and would be the spark to the further advancements of the present and new sources. PMID:25855456

  9. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography

    DOEpatents

    Chapman, Henry N.; Nugent, Keith A.

    2002-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  10. Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography

    DOEpatents

    Chapman, Henry N.; Nugent, Keith A.

    2001-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  11. An Extreme Flux Vacuum Ultraviolet/Ultraviolet Beamline For The Measurement Of Biological Circular Dichroism

    SciTech Connect

    Clarke, D.T.; Vasanthi, N.; Shaw, D.; Brown, A.; Todd, B.; Grant, A.F.; Flaherty, J.V.; Mullacrane, I.D.; Miller, M.J.; Bowler, M.A.; Jones, G.R.; Mythen, C.

    2004-05-12

    A new extreme flux vacuum ultraviolet bending magnet beamline (CD12) has been commission at the SRS, Daresbury. The beamline has met all of its designed performance parameters and these are detailed. The clear advantages of SRCD over CD undertaken on conventional instruments are discussed and examples of its capabilities in terms of measurement precision and enhanced signal-to-noise for both steady-state CD and time-resolved CD are given.

  12. Extreme ultraviolet lithography: A few more pieces of the puzzle

    SciTech Connect

    Anderson, Christopher N.

    2009-05-20

    The work described in this dissertation has improved three essential components of extreme ultraviolet (EUV) lithography: exposure tools, photoresist, and metrology. Exposure tools. A field-averaging illumination stage is presented that enables nonuniform, high-coherence sources to be used in applications where highly uniform illumination is required. In an EUV implementation, it is shown that the illuminator achieves a 6.5% peak-to-valley intensity variation across the entire design field of view. In addition, a design for a stand-alone EUV printing tool capable of delivering 15 nm half-pitch sinusoidal fringes with available sources, gratings and nano-positioning stages is presented. It is shown that the proposed design delivers a near zero line-edge-rougness (LER) aerial image, something extremely attractive for the application of resist testing. Photoresist. Two new methods of quantifying the deprotection blur of EUV photoresists are described and experimentally demonstrated. The deprotection blur, LER, and sensitivity parameters of several EUV photoresists are quantified simultaneously as base weight percent, photoacid generator (PAG) weight percent, and post-exposure bake (PEB) temperature are varied. Two surprising results are found: (1) changing base weight percent does not significantly affect the deprotection blur of EUV photoresist, and (2) increasing PAG weight percent can simultaneously reduce LER and E-size in EUV photoresist. The latter result motivates the development of an EUV exposure statistics model that includes the effects of photon shot noise, the PAG spatial distribution, and the changing of the PAG distribution during the exposure. In addition, a shot noise + deprotection blur model is used to show that as deprotection blur becomes large relative to the size of the printed feature, LER reduction from improved counting statistics becomes dominated by an increase in LER due to reduced deprotection contrast. Metrology. Finally, this

  13. Self-cleaning optic for extreme ultraviolet lithography

    DOEpatents

    Klebanoff, Leonard E.; Stulen, Richard H.

    2003-12-16

    A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.

  14. Extreme ultraviolet emission spectra of Gd and Tb ions

    SciTech Connect

    Kilbane, D.; O'Sullivan, G.

    2010-11-15

    Theoretical extreme ultraviolet emission spectra of gadolinium and terbium ions calculated with the Cowan suite of codes and the flexible atomic code (FAC) relativistic code are presented. 4d-4f and 4p-4d transitions give rise to unresolved transition arrays in a range of ions. The effects of configuration interaction are investigated for transitions between singly excited configurations. Optimization of emission at 6.775 nm and 6.515 nm is achieved for Gd and Tb ions, respectively, by consideration of plasma effects. The resulting synthetic spectra are compared with experimental spectra recorded using the laser produced plasma technique.

  15. MoRu/Be multilayers for extreme ultraviolet applications

    DOEpatents

    Bajt, Sasa C.; Wall, Mark A.

    2001-01-01

    High reflectance, low intrinsic roughness and low stress multilayer systems for extreme ultraviolet (EUV) lithography comprise amorphous layers MoRu and crystalline Be layers. Reflectance greater than 70% has been demonstrated for MoRu/Be multilayers with 50 bilayer pairs. Optical throughput of MoRu/Be multilayers can be 30-40% higher than that of Mo/Be multilayer coatings. The throughput can be improved using a diffusion barrier to make sharper interfaces. A capping layer on the top surface of the multilayer improves the long-term reflectance and EUV radiation stability of the multilayer by forming a very thin native oxide that is water resistant.

  16. Tabletop Extreme Ultraviolet Spectroscopy of Element-Specific Organometallic Photophysics

    NASA Astrophysics Data System (ADS)

    Vura-Weis, Josh

    High-harmonic extreme ultraviolet (XUV) spectroscopy has the potential to provide the elemental, oxidation-state, and spin-state specificity of core-level spectroscopy with the convenience and ultrafast time resolution of tabletop laser sources. We will show that M-edge spectroscopy of first-row transition metal complexes (3p -->3d excitation) is a sensitive probe of the electronic structure of organometallic complexes in solution. Furthermore, this technique can be used to determine the relaxation dynamics of these molecules in the first few femtoseconds to nanoseconds after photoexcitation.

  17. High numerical aperture projection system for extreme ultraviolet projection lithography

    DOEpatents

    Hudyma, Russell M.

    2000-01-01

    An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.

  18. Critical illumination condenser for extreme ultraviolet projection lithography

    NASA Astrophysics Data System (ADS)

    Cohen, S. J.; Seppala, L. G.

    1995-03-01

    A condenser system couples a radiation source to an imaging system. The authors have designed a critical illumination condenser system which meets the technical challenges of extreme ultraviolet projection lithography based on a ring field imaging system and a laser produced plasma source. The optical system, a three spherical mirror optical design, is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. This type of condenser optical design is sufficiently versatile to be employed with two distinct systems, one from Lawrence Livermore National Laboratory and one from AT and T/Sandia.

  19. A rocket measurement of the extreme ultraviolet dayglow

    NASA Technical Reports Server (NTRS)

    Christensen, A. B.

    1976-01-01

    Extreme ultraviolet spectra of the mid-latitude dayglow in the wavelength range of 550 to 1250A have been obtained with a rocket borne grating spectrometer at a resolution of 20A. Spectra were obtained in the altitude range of 140 to 280 km. The spectra are dominated by emissions from atomic multiplets and no molecular bands have been identified with certainty. The strongest emissions other than H Lyman-alpha are OI (989) and OII (834). Other prominent emissions include He I(584), N II(916) and N II(1085). An unexpected feature near 612A has an intensity comparable to He I(584).

  20. Interferometry in the Extreme Ultraviolet and X-Ray

    NASA Technical Reports Server (NTRS)

    Cash, W.; Shipley, A.; Osterman, S.; Joy, M. K.

    2000-01-01

    We report on demonstration of an x-ray interferometer that uses plane mirrors at grazing incidence to create interference fringes in the extreme ultraviolet and soft x-ray portions of the spectrum. X-ray interferometry has historically been implemented through narrow band, diffractive systems that split the wavefront. Our system, by using two separate optical channels to create interference from two areas of the wavefront, has broad band response and much higher efficiency. We discuss some applications of this technique to astronomy and microscopy including the possibility of eventually capturing a micro-arcsecond image of a black hole.

  1. Chemical vapor deposited silicon carbide mirrors for extreme ultraviolet applications

    NASA Astrophysics Data System (ADS)

    Keski-Kuha, Ritva A.; Osantowski, John F.; Leviton, Douglas B.; Saha, Timo T.; Wright, Geraldine A.; Boucarut, Rene A.; Fleetwood, Charles M.; Madison, Timothy J.

    1997-01-01

    Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency in the extreme ultraviolet (EUV). For example, the development of the chemical vapor deposition (CVD) SiC mirrors provides an opportunity to extend the range of normal-incidence instruments dow to 60 nm. CVD SiC is a highly polishable material yielding low- scattering surfaces. High UV reflectivity and desirable mechanical and thermal properties make CVD SiC an attractive mirror and/or coating material for EUV applications. The EUV performance of SiC mirrors, as well as some strengths and problem areas, is discussed.

  2. Extreme ultraviolet and visible spectroscopy of promethiumlike heavy ions

    NASA Astrophysics Data System (ADS)

    Kobayashi, Yusuke; Kubota, Kai; Omote, Kazuki; Komatsu, Akihiro; Sakoda, Junpei; Minoshima, Maki; Kato, Daiji; Li, Jiguang; Sakaue, Hiroyuki A.; Murakami, Izumi; Nakamura, Nobuyuki

    2015-08-01

    We present extreme ultraviolet and visible spectra of promethiumlike tungsten and gold obtained with an electron beam ion trap. Although the contributions from a few charge states are involved in the spectra, the charge state of the ion assigned to the observed lines is definitely identified by the time-of-flight (TOF) analysis of the ions performed at the same time with the spectroscopic measurements. Experimental results are compared with collisional-radiative model calculations as well as previous experimental and theoretical studies. Some ambiguous identifications in the previous observations have been clarified owing to the definite identification by the TOF analysis.

  3. The Emergence of Alternative Developers for Extreme Ultraviolet Lithography

    NASA Astrophysics Data System (ADS)

    Itani, Toshiro; Santillan, Julius Joseph

    2010-09-01

    Recent work on extreme ultraviolet (EUV) resists has shown the application of alternative resist processes as a possible solution to achieve lithographic performance targets. In this study, the potential of tetrabutylammonium hydroxide (TBAH) as a possible alternative to the currently used tetramethylammonium hydroxide developer solution was investigated. A significant improvement in lithographic performance was achieved using the TBAH developer. However, this developer solution has a relatively high freezing temperature, particularly at high concentrations. We report that the addition of glycerin to the TBAH developer lowered the freezing temperature without adversely affecting lithographic performance.

  4. Characteristics of extreme ultraviolet emission from high-Z plasmas

    NASA Astrophysics Data System (ADS)

    Ohashi, H.; Higashiguchi, T.; Suzuki, Y.; Kawasaki, M.; Suzuki, C.; Tomita, K.; Nishikino, M.; Fujioka, S.; Endo, A.; Li, B.; Otsuka, T.; Dunne, P.; O'Sullivan, G.

    2016-03-01

    We demonstrate the extreme ultraviolet (EUV) and soft x-ray sources in the 2 to 7 nm spectral region related to the beyond EUV (BEUV) question at 6.x nm and the water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays (UTAs), extending below the carbon K edge (4.37 nm). An outline of a microscope design for single-shot live cell imaging is proposed based on high-Z plasma UTA source, coupled to multilayer mirror optics.

  5. Extreme ultraviolet radiation emitted by helium microwave driven plasmas

    NASA Astrophysics Data System (ADS)

    Espinho, S.; Felizardo, E.; Tatarova, E.; Alves, L. L.

    2016-06-01

    The extreme ultraviolet radiation emitted by helium microwave-driven (2.45 GHz) plasmas operating at low-pressure conditions was investigated. Novel data regarding emitted spectral lines of excited helium atoms and ions in the 20-33 nm wavelength range and their intensity behavior with variation of discharge operational conditions are presented. The intensity of all the spectral emissions was found to strongly increase with the microwave power delivered to the plasma. Furthermore, the intensity of the ionic spectral emissions decreases by nearly one order of magnitude as the pressure was raised from 0.2 to 0.5 mbar.

  6. Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

    SciTech Connect

    Jody Corso, Alain; Nicolosi, Piergiorgio; Nardello, Marco; Guglielmina Pelizzo, Maria; Department of Information Engineering, University of Padova, via Gradenigo 6 Zuppella, Paola; Barkusky, Frank; KLA-Tencor, 5 Technology Dr., Milpitas, California 95035 ; Mann, Klaus; Mueller, Matthias

    2013-05-28

    Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneath.

  7. Understanding the Early Evolution of M dwarf Extreme Ultraviolet Radiation

    NASA Astrophysics Data System (ADS)

    Peacock, Sarah; Barman, Travis; Shkolnik, Evgenya

    2015-11-01

    The chemistry and evolution of planetary atmospheres depends on the evolution of high-energy radiation emitted by its host star. High levels of extreme ultraviolet (EUV) radiation can drastically alter the atmospheres of terrestrial planets through ionizing, heating, expanding, chemically modifying and eroding them during the first few billion years of a planetary lifetime. While there is evidence that stars emit their highest levels of far and near ultraviolet (FUV; NUV) radiation in the earliest stages of their evolution, we are currently unable to directly measure the EUV radiation. Most previous stellar atmosphere models under-predict FUV and EUV emission from M dwarfs; here we present new models for M stars that include prescriptions for the hot, lowest density atmospheric layers (chromosphere, transition region and corona), from which this radiation is emitted. By comparing our model spectra to GALEX near and far ultraviolet fluxes, we are able to predict the evolution of EUV radiation for M dwarfs from 10 Myr to a few Gyr. This research is the next major step in the HAZMAT (HAbitable Zones and M dwarf Activity across Time) project to analyze how the habitable zone evolves with the evolving properties of stellar and planetary atmospheres.

  8. EDITORIAL: Extreme Ultraviolet Light Sources for Semiconductor Manufacturing

    NASA Astrophysics Data System (ADS)

    Attwood, David

    2004-12-01

    The International Technology Roadmap for Semiconductors (ITRS) [1] provides industry expectations for high volume computer chip fabrication a decade into the future. It provides expectations to anticipated performance and requisite specifications. While the roadmap provides a collective projection of what international industry expects to produce, it does not specify the technology that will be employed. Indeed, there are generally several competing technologies for each two or three year step forward—known as `nodes'. Recent successful technologies have been based on KrF (248 nm), and now ArF (193 nm) lasers, combined with ultraviolet transmissive refractive optics, in what are known as step and scan exposure tools. Less fortunate technologies in the recent past have included soft x-ray proximity printing and, it appears, 157 nm wavelength F2 lasers. In combination with higher numerical aperture liquid emersion optics, 193 nm is expected to be used for the manufacture of leading edge chip performance for the coming five years. Beyond that, starting in about 2009, the technology to be employed is less clear. The leading candidate for the 2009 node is extreme ultraviolet (EUV) lithography, however this requires that several remaining challenges, including sufficient EUV source power, be overcome in a timely manner. This technology is based on multilayer coated reflective optics [2] and an EUV emitting plasma. Following Moore's Law [3] it is expected, for example, that at the 2009 `32 nm node' (printable patterns of 32 nm half-pitch), isolated lines with 18 nm width will be formed in resist (using threshold effects), and that these will be further narrowed to 13 nm in transfer to metalized electronic gates. These narrow features are expected to provide computer chips of 19 GHz clock frequency, with of the order of 1.5 billion transistors per chip [1]. This issue of Journal of Physics D: Applied Physics contains a cluster of eight papers addressing the critical

  9. Spectrophotometry of extreme helium stars - Ultraviolet fluxes and effective temperatures

    NASA Technical Reports Server (NTRS)

    Heber, U.; Drilling, J. S.; Schoenberner, D.; Lynas-Gray, A. E.

    1984-01-01

    Ultraviolet flux distributions are presented for the extremely helium rich stars BD +10 deg 2179, HD 124448, LSS 3378, BD -9 deg 4395, LSE 78, HD 160641, LSIV -1 deg 2, BD 1 deg 3438, HD 168476, MV Sgr, LS IV-14 deg 109 (CD -35 deg 11760), LSII +33 deg 5 and BD +1 deg 4381 (LSIV +2 deg 13) obtained with the International Ultraviolet Explorer (IUE). Broadband photometry and a newly computed grid of line blanketed model atmospheres were used to determine accurate angular diameters and total stellar fluxes. The resultant effective temperatures are in most cases in satisfactory agreement with those based on broadband photometry and/or high resolution spectroscopy in the visible. For two objects, LSII +33 deg 5 and LSE 78, disagreement was found between the IUE observations and broadband photometry: the colors predict temperatures around 20,000 K, whereas the UV spectra indicate much lower photospheric temperatures of 14,000 to 15,000 K. The new temperature scale for extreme helium stars extends to lower effective temperatures than that of Heber and Schoenberner (1981) and covers the range from 8,500 K to 32,000 K. Previously announced in STAR as N83-24433

  10. Stress-induced pellicle analysis for extreme-ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Park, Eun-Sang; Kim, Min-Ha; Hwang, Sollee; Kim, Jung Hwan; Oh, Hye-Keun

    2016-03-01

    The defect on the extreme ultraviolet (EUV) mask can cause image quality degradation on the wafer and also poses a serious problem for achieving high volume manufacturing (HVM). Using a pellicle could decrease the critical size of a defect by taking the defect away from the focal plane of a mask. Considering the double pass transmission for the thickness of extreme ultraviolet lithography EUVL pellicle should be ~ nm thin. For ~ nm thin pellicle, the thermal stress by EUV light exposure may damage the pellicle. Therefore, an investigation of thermal stress is desired for reliable EUV light transmission through pellicle. Therefore, we calculated the total stress and compared with material maximum stress of the pellicle. Breaking or the safety of the pellicle could be determined by the induced total stress, however, the cyclic exposure heating could decrease the material maximum stress of the pellicle. The c-Si (crystalline silicon) has good mechanical durability than the p-Si (poly-crystalline silicon) under cyclic thermal exposure.

  11. Characterization of Multilayer Reflective Coatings for Extreme Ultraviolet Lithography

    SciTech Connect

    Wedowski, M.; Gullikson, E.M.; Underwood, J.H.; Spiller, E.A.; Montcalm, C.; Kearney, P.A.; Bajt, S.; Schmidt, M.A.; Folta, J.A.

    1999-11-01

    The synchrotron-based reflectometer at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley is an important metrology tool within the current Extreme Ultraviolet Lithography (EUVL) program. This program is a joint activity of three National Laboratories and a consortium of leading semiconductor manufacturers. Its goal is the development of a technology for routine production of sub-100 nm feature sizes for microelectronic circuits. Multilayer-coated normal-incidence optical surfaces reflecting in the Extreme Ultraviolet (EUV) spectral range near 13 nm are the basis for this emerging technology. All optical components of EUV lithographic steppers need to be characterized at-wavelength during their development and manufacturing process. Multilayer coating uniformity and gradient, accurate wavelength matching and high peak reflectances are the main parameters to be optimized. The mechanical and optical properties of the reflectometer at ALS beamline 6.3.2 proved to be well suited for the needs of the current EUVL program. In particular the facility is highly precise in its wavelength calibration and the determination of absolute EUV reflectance. The reproducibility of results of measurements at ALS beamline 6.3.2 is 0.2 % for reflectivity and 0.002 nm for wavelength.

  12. Studying Laser-Induced Spin Currents Using Ultrafast Extreme Ultraviolet Light

    NASA Astrophysics Data System (ADS)

    Turgut, Emrah

    Next-generation magnetic-memory devices and heat-assisted magnetic-recording applications will require a better understanding of magnetic multilayers and their interactions with optical-laser pulses. In this thesis, by combining the advantages of ultrabroad-band extreme-ultraviolet light including ultrafast time resolution, element selectivity and tabletop easy access, I report three findings in the study of ultrafast magnetization dynamics in itinerant ferromagnets. First, I experimentally prove that the transverse magneto-optical Kerr response with extreme-ultraviolet light has a purely magnetic origin and that our experimental technique is an artifact-free ultrafast magnetic probe. Second, I demonstrate the first ultrafast magnetization enhancement driven by ultrafast spin currents in Ni/Ru/Fe multilayers. Third, I engineer the sample system by choosing either insulating or spin-scattering spacer layers between the Ni and Fe magnetic layers and by structural ordering. Then, I control the competition between ultrafast spin-flip scattering and superdiffusive spin-current mechanisms; either of these processes may to be the dominant mechanism in ultrafast demagnetization. Finally, I report two continuing experiments that are promising for future ultrafast magnetization studies with extreme-ultraviolet sources. These experiments are resonant-magnetic small-angle-scattering and the generation of bright circularly polarized high harmonics accompanied by a demonstration of the first x-ray magnetic circular dichroism with a tabletop system.

  13. The Second Extreme Ultraviolet Explorer Right Angle Program Catalog

    NASA Astrophysics Data System (ADS)

    Christian, D. J.; Craig, N.; Cahill, W.; Roberts, B.; Malina, R. F.

    1999-05-01

    We present the detection of 235 extreme ultraviolet sources, of which 169 are new detections, using the Extreme Ultraviolet Explorer's (EUVE) Right Angle Program (RAP) data. This catalog includes observations since the first EUVE RAP catalog (1994 January) and covers 17% of the sky. The EUVE RAP uses the all-sky survey telescopes (also known as ``scanners''), mounted at right angles to the Deep Survey and spectrometer instruments, to obtain photometric data in four wavelength bands centered at ~100 Å (Lexan/B), ~200 Å (Al/Ti/C), ~400 Å (Ti/Sb/Al), and ~550 Å (Sn/SiO). This allows the RAP to accumulate data serendipitously during pointed spectroscopic observations. The long exposure times possible with RAP observations provide much greater sensitivity than the all-sky survey. We present EUVE source count rates and probable source identifications from the available catalogs and literature. The source distribution is similar to previous extreme ultraviolet (EUV) catalogs with 2% early-type stars, 45% late-type stars, 8% white dwarfs, 6% extragalactic, 24% with no firm classification, and 15% with no optical identification. We also present 36 detections of early-type stars that are probably the result of non-EUV radiation. We have detected stellar flares from approximately 12 sources, including: EUVE J0008+208, M4 star G32-6 (EUVE J0016+198), a new source EUVE J0202+105, EUVE J0213+368, RS CVn V711 Tau (EUVE J0336+005), BY Draconis type variable V837 Tau (EUVE J0336+259), the new K5 binary EUVE J0725-004, EUVE J1147+050, EUVE J1148-374, EUVE J1334-083 (EQ Vir), EUVE J1438-432 (WT 486/487), EUVE J1808+297, and the M5.5e star G208-45 (EUVE J1953+444). We present sample light curves for the brighter sources.

  14. Solar extreme ultraviolet irradiance: Present, past, and future

    NASA Astrophysics Data System (ADS)

    Lean, J. L.; Woods, T. N.; Eparvier, F. G.; Meier, R. R.; Strickland, D. J.; Correira, J. T.; Evans, J. S.

    2011-01-01

    New models of solar extreme ultraviolet (EUV) irradiance variability are constructed in 1 nm bins from 0 to 120 nm using multiple regression of the Mg II and F10.7 solar activity indices with irradiance observations made during the descending phase of cycle 23. The models have been used to reconstruct EUV spectra daily since 1950, annually since 1610, to forecast daily EUV irradiance and to estimate future levels in cycle 24. A two-component model developed by scaling the observed rotational modulation of the two solar indices underestimates the solar cycle changes that the Solar EUV Experiment (SEE) reports at wavelengths shorter than 40 nm and longer than 80 nm. A three-component model implemented by including an additional term derived from the smoothed Mg II index better reproduces the measurements at all wavelengths. The three-component model is consistent with variations in the EUV energy from 0 to 45 nm that produces the far ultraviolet (FUV) terrestrial dayglow observed by the Global Ultraviolet Imager (GUVI). However, the spectral structure of this third component is complex, and its origin is uncertain. Analogous two- and three-component models are also developed with absolute scales determined by the NRLEUV2 spectrum of the quiet Sun rather than by the SEE average spectrum. Assessment of the EUV absolute spectrum and variability of the four different models indicate that during solar cycle 23, the EUV irradiance (0 to 120 nm) increased 100 ± 30%, from 2.9 ± 0.2 to 5.8 ± 0.9 mWm-2, and may have been as low as 1.9 ± 0.5 mWm-2 during the 17th-century Maunder Minimum. Near the peak of upcoming solar cycle 24, EUV irradiance is expected to increase 40% to 80% above the 2008 minimum values.

  15. Toward defect-free fabrication of extreme ultraviolet photomasks

    NASA Astrophysics Data System (ADS)

    Qi, Zhengqing John; Rankin, Jed H.; Lawliss, Mark; Badger, Karen D.; Turley, Christina

    2016-04-01

    Defect-free fabrication of extreme ultraviolet (EUV) masks relies on the appropriate detection of native defects and subsequent strategies for their elimination. Commercial unavailability of actinic mask-blank inspection systems motivates the identification of an optical inspection methodology most suitable for finding relevant EUV blank defects. Studies showed that 193-nm wavelength inspection found the greatest number of printable defects as compared with rival higher-wavelength systems, establishing deep ultraviolet inspections as the blank defectivity baseline for subsequent mitigation strategies. Next, defect avoidance via pattern shifting was explored using representative 7-nm node metal/contact layer designs and 193-nm mask-blank inspection results. It was found that a significant percentage of native defects could be avoided only when the design was limited to active patterns (i.e., layouts without dummy fill). Total pattern-defect overlap remained ≤5 when metal layer blanks were chosen from the top 35% least defective substrates, while the majority of blanks remained suitable for contacts layers due to a lower active pattern density. Finally, nanomachining was used to address remaining native/multilayer defects. Native catastrophic defects were shown to recover 40% to 70% of target critical dimension after nanomachining, demonstrating the enormous potential for compensating multilayer defects.

  16. Extreme- and far-ultraviolet environment at shuttle altitudes

    SciTech Connect

    Chakrabarti, S.

    1987-01-01

    The astronomical data obtained by the Far Ultraviolet Space Telescope (FAUST) and the Very Wide Field Camera (VWFC) on board the Spacelab I mission have triggered questions on the natural and induced Extreme and Far Ultraviolet (EUV and FUV) environment of the space shuttle. Moreover, the recent discovery of approx. lk Rayleighs N/sub 2/ Lyman Birge Hopfield (LBH) nightglow emissions by the U.S. Air Force's S3-4 satellite, and subsequent confirmation by the Imaging Spectrometric Observatory (ISO) experiment on the Spacelab I mission have serious implications for the astronomical observations from the shuttle. Since both ISO and S3-4 experiments were conducted from shuttle altitudes, the implied EUV and FUV environment for astronomical observations can be severe. In order to address the question of the suitability of the shuttle as an astronomical platform, data from FAUST and other experiments were examined. It is concluded that the FAUST background is most likely due to the observation of tropical UV arcs, a natural airglow phenomenon. Strategies for future shuttle experiments to overcome this and other natural emissions are discussed.

  17. Extreme ultraviolet explorer satellite observation of Jupiter's Io plasma torus

    NASA Technical Reports Server (NTRS)

    Hall, D. T; Gladstone, G. R.; Moos, H. W.; Bagenal, F.; Clarke, J. T.; Feldman, P. D.; Mcgrath, M. A.; Schneider, N. M.; Shemansky, D. E.; Strobel, D. F.

    1994-01-01

    We present the first Extreme Ultraviolet Explorer (EUVE) satellite observation of the Jupiter system, obtained during the 2 day period 1993 March 30 through April 1, which shows a rich emission-line spectrum from the Io plasma torus spanning wavelengths 370 to 735 A. The emission features correspond primarily to known multiplets of oxygen and sulfur ions, but a blended feature near 372 A is a plausible Na II transition. The summed detected energy flux of (7.2 +/- 0.2) x 10(exp -11) ergs/sq cm(s) corresponds to a radiated power of approximately equal to 4 x 10(exp 11) W in this spectral range. All ansa emissions show a distinct dawn-dusk brightness asymmetry and the measured dusk/dawn ratio of the bright S III lambda-680 feature is 2.3 +/- 0.3, significantly larger than the ratio measured by the Voyager spacecraft ultraviolet (UV) instruments. A preliminary estimate of ion partitioning indicates that the oxygen/sulfur ion ratio is approximately equal to 2, compared to the value approximately equal to 1.3 measured by Voyager, and that (Na(+))/(e) greater than 0.01.

  18. THE EXTREME-ULTRAVIOLET EMISSION FROM SUN-GRAZING COMETS

    SciTech Connect

    Bryans, P.; Pesnell, W. D.

    2012-11-20

    The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory has observed two Sun-grazing comets as they passed through the solar atmosphere. Both passages resulted in a measurable enhancement of extreme-ultraviolet (EUV) radiance in several of the AIA bandpasses. We explain this EUV emission by considering the evolution of the cometary atmosphere as it interacts with the ambient solar atmosphere. Molecules in the comet rapidly sublimate as it approaches the Sun. They are then photodissociated by the solar radiation field to create atomic species. Subsequent ionization of these atoms produces a higher abundance of ions than normally present in the corona and results in EUV emission in the wavelength ranges of the AIA telescope passbands.

  19. Method for the protection of extreme ultraviolet lithography optics

    DOEpatents

    Grunow, Philip A.; Clift, Wayne M.; Klebanoff, Leonard E.

    2010-06-22

    A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.

  20. Ne-like ion lasers in the extreme ultraviolet region

    SciTech Connect

    Li, Y.; Pretzler, G.; Fill, E.E.

    1995-11-01

    We report strong {ital J}=0--1, 3{ital p}-3{ital s} lasing in Ne-like scandium, calcium, potassium, and chlorine at wavelengths ranging from 35.3 nm in scandium to 52.9 nm in chlorine. The experiments were carried out with the ASTERIX IV iodine laser using a 15% prepulse 5.2 ns before the main pulse. These results extend the range of laser plasma x-ray lasers into the extreme ultraviolet region. Gain lengths between 7 and 11 were measured for the different lines. The 38.3-nm laser in calcium lased at an intensity as low as 5{times}10{sup 12} W/cm{sup {minus}2}.

  1. Upgrade of absolute extreme ultraviolet diagnostic on J-TEXT.

    PubMed

    Zhang, X L; Cheng, Z F; Hou, S Y; Zhuang, G; Luo, J

    2014-11-01

    The absolute extreme ultraviolet (AXUV) diagnostic system is used for radiation observation on J-TEXT tokamak [J. Zhang, G. Zhuang, Z. J. Wang, Y. H. Ding, X. Q. Zhang, and Y. J. Tang, Rev. Sci. Instrum. 81, 073509 (2010)]. The upgrade of the AXUV system is aimed to improve the spatial resolution and provide a three-dimensional image on J-TEXT. The new system consists of 12 AXUV arrays (4 AXUV16ELG arrays, 8 AXUV20ELG arrays). The spatial resolution in the cross-section is 21 mm for the AXUV16ELG arrays and 17 mm for the AXUV20ELG arrays. The pre-amplifier is also upgraded for a higher signal to noise ratio. By upgrading the AXUV imaging system, a more accurate observation on the radiation information is obtained. PMID:25430327

  2. Upgrade of absolute extreme ultraviolet diagnostic on J-TEXT

    SciTech Connect

    Zhang, X. L.; Cheng, Z. F. Hou, S. Y.; Zhuang, G.; Luo, J.

    2014-11-15

    The absolute extreme ultraviolet (AXUV) diagnostic system is used for radiation observation on J-TEXT tokamak [J. Zhang, G. Zhuang, Z. J. Wang, Y. H. Ding, X. Q. Zhang, and Y. J. Tang, Rev. Sci. Instrum. 81, 073509 (2010)]. The upgrade of the AXUV system is aimed to improve the spatial resolution and provide a three-dimensional image on J-TEXT. The new system consists of 12 AXUV arrays (4 AXUV16ELG arrays, 8 AXUV20ELG arrays). The spatial resolution in the cross-section is 21 mm for the AXUV16ELG arrays and 17 mm for the AXUV20ELG arrays. The pre-amplifier is also upgraded for a higher signal to noise ratio. By upgrading the AXUV imaging system, a more accurate observation on the radiation information is obtained.

  3. Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy

    NASA Astrophysics Data System (ADS)

    Schmitz, Christoph; Wilson, Daniel; Rudolf, Denis; Wiemann, Carsten; Plucinski, Lukasz; Riess, Sally; Schuck, Martin; Hardtdegen, Hilde; Schneider, Claus M.; Tautz, F. Stefan; Juschkin, Larissa

    2016-06-01

    We report on the combination of a state-of-the-art energy-filtering photoemission electron microscope with an intense yet compact laboratory-based gas discharge extreme ultraviolet (EUV) light source. Using a photon energy of 71.7 eV from oxygen plasma (O5+ spectral line), we demonstrate element-selective photoelectron imaging in real space and band structure mapping in reciprocal space. Additionally, the high surface sensitivity of the EUV light was used to study the surface oxidation on islands of the phase-change material Ge1Sb2Te4 . The EUV light source allows the extension of spectromicroscopy, previously only feasible at synchrotron beamlines, to laboratory-based work.

  4. The Extreme-ultraviolet Emission from Sun-grazing Comets

    NASA Technical Reports Server (NTRS)

    Bryans, Paul; Pesnell, William D.

    2012-01-01

    The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory has observed two Sun-grazing comets as they passed through the solar atmosphere. Both passages resulted in a measurable enhancement of extreme-ultraviolet (EUV) radiance in several of the AIA bandpasses.We explain this EUV emission by considering the evolution of the cometary atmosphere as it interacts with the ambient solar atmosphere. Molecules in the comet rapidly sublimate as it approaches the Sun. They are then photodissociated by the solar radiation field to create atomic species. Subsequent ionization of these atoms produces a higher abundance of ions than normally present in the corona and results in EUV emission in the wavelength ranges of the AIA telescope passbands.

  5. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength

    NASA Astrophysics Data System (ADS)

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-08-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam.

  6. Extreme ultraviolet mask substrate surface roughness effects on lithography patterning

    SciTech Connect

    George, Simi; Naulleau, Patrick; Salmassi, Farhad; Mochi, Iacopo; Gullikson, Eric; Goldberg, Kenneth; Anderson, Erik

    2010-06-21

    In extreme ultraviolet lithography exposure systems, mask substrate roughness induced scatter contributes to LER at the image plane. In this paper, the impact of mask substrate roughness on image plane speckle is explicitly evaluated. A programmed roughness mask was used to study the correlation between mask roughness metrics and wafer plane aerial image inspection. We find that the roughness measurements by top surface topography profile do not provide complete information on the scatter related speckle that leads to LER at the image plane. We suggest at wavelength characterization by imaging and/or scatter measurements into different frequencies as an alternative for a more comprehensive metrology of the mask substrate/multilayer roughness effects.

  7. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength

    PubMed Central

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-01-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam. PMID:27501749

  8. Defect formation in single layer graphene under extreme ultraviolet irradiation

    NASA Astrophysics Data System (ADS)

    Gao, A.; Zoethout, E.; Sturm, J. M.; Lee, C. J.; Bijkerk, F.

    2014-10-01

    We study extreme ultraviolet (EUV) radiation induced defects in single-layer graphene. Two mechanisms for inducing defects in graphene were separately investigated: photon induced chemical reactions between graphene and background residual gases, and breaking sp2 bonds, due to photon and/or photoelectrons induced bond cleaving. Raman spectroscopy shows that D peak intensities grow after EUV irradiation with increasing water partial pressure in the exposure chamber. Temperature-programmed desorption (TPD) experiments prove that EUV radiation results in water dissociation on the graphene surface. The oxidation of graphene, caused by water dissociation, is triggered by photon and/or photoelectron induced dissociation of water. Our studies show that the EUV photons break the sp2 bonds, forming sp3 bonds, leading to defects in graphene.

  9. At-wavelength interferometry of extreme ultraviolet lithographic optics

    SciTech Connect

    Lee, Sang Hun; Naulleau, Patrick; Goldberg, Kenneth; Medecki, Hector; Bresloff, Cynthia; Chang, Chang; Attwood, David; Bokor, Jeffrey; Chang, Chang; Attwood, David; Bokor, Jeffrey Tejnil, Edita

    1998-11-01

    A phase-shifting point diffraction interferometer (PS/PDI) has recently been developed to evaluate optics for extreme ultraviolet (EUV) projection lithography systems. The interferometer has been implemented at the Advanced Light Source at Lawrence Berkeley National Laboratory and is currently being used to test experimental EUV Schwarzschild objectives. Recent PS/PDI measurements indicate these experimental objectives to have wavefront errors on the order of 0.1 waves ({approximately}1 nm at a wavelength of 13.4 nm) rms. These at-wavelength measurements have also revealed the multilayer phase effects, demonstrating the sensitivity and importance of EUV characterization. The measurement precision of the PS/PDI has been experimentally determined to be better than 0.01 waves. Furthermore, a systematic-error-limited absolute measurement accuracy of 0.004 waves has been demonstrated. {copyright} {ital 1998 American Institute of Physics.}

  10. Normal incidence multilayer mirrors for extreme ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Stern, R. A.; Haisch, B. M.; Joki, E. G.; Catura, R. C.

    1984-01-01

    Sputtered multilayer coatings allow the use of normal incidence optics in the extreme ultraviolet (EUV) region below 500 A. Multilayer mirrors can be tailored to provide images at strong EUV lines in the sun and stars, in many cases making more efficient use of the telescope aperture than grazing incidence optics. Alternatively, the bandpass can be broadened at the expense of peak effective area, by varying the multilayer structure over the mirror surface. Such mirrors can also serve as optical elements in spectrographs for investigation of specific emission and absorption line complexes, and are self-filtering in that they reject nearby geocoronal and cosmic resonance line backgrounds. Current efforts at the Lockheed Palo Alto Research Laboratory in the design, fabrication, and testing of EUV multilayer mirrors are discussed. This program includes the design and fabrication of normal incidence EUV multilayer mirrors, and the deposition of multilayers on lacquer-coated substrates.

  11. Extreme ultraviolet spectrograph ATM experiment S082B

    NASA Technical Reports Server (NTRS)

    Bartoe, J.-D. F.; Brueckner, G. E.; Purcell, J. D.; Tousey, R.

    1977-01-01

    The extreme-ultraviolet double-dispersion photographic spectrograph for the Apollo Telescope Mount (ATM) experiment S082B on Skylab is described. Novel features were the use of a predisperser grating with a ruling whose spacing varied approximately linearly with distance for the purpose of increasing the instrument speed by reducing the astigmatism and a photoelectric servosystem to stabilize to 1 sec of arc the solar image at various near-limb positions. The 970-3940-A range was covered in two sections with effective resolving power of approximately 30,000 from 1100 A to 1970 A. The spatial resolution was 2 x 60 solar sec of arc. During the Skylab mission 6400 exposures were made with the instrument pointed by an astronaut at selected and recorded solar positions.

  12. Efficient extreme ultraviolet transmission gratings for plasma diagnostics

    NASA Astrophysics Data System (ADS)

    Braig, Christoph; Predehl, Peter; Kley, Ernst-Bernhard

    2011-06-01

    We report on a theoretical study of free-standing phase transmission gratings for high-resolution extreme ultraviolet (EUV) and soft x-ray spectroscopy and investigate their properties. Designed for wavelengths between about 2 and 40 nm, the devices may provide a first order diffraction efficiency beyond 30%. We use rigorous coupled wave analysis methods in order to optimize the grating design parameters and discuss features of segmented grating arrays. Elemental, as well as compound, materials such as Be, Mo, LiF, and poly-(methylmethacrylate) are considered with respect to their potential and practical limitations in terms of feasibility and sensitivity to radiation damage. Simulations are performed for several samples on the radiation produced by a table-top EUV plasma source and applications to astrophysical problems are considered.

  13. Electron impact excitation of argon in the extreme vacuum ultraviolet

    NASA Technical Reports Server (NTRS)

    Mentall, J. E.; Morgan, H. D.

    1976-01-01

    Polarization-free excitation cross sections in the extreme vacuum ultraviolet have been measured for electron impact on Ar. Observed spectral features were those lines of Ar I and Ar II which lie between 700 and 1100 A. Excitation functions were measured for the Ar I resonance line at 1048 A and the Ar II resonance line at 920 A. Peak cross sections for these two lines were found to be (39.4 plus or minus 7.9) x 10 to the -18th and (6.9 plus or minus 1.4) x 10 to the -18th, respectively. At low energies, excitation of the Ar II resonance line is dominated by an electron exchange transition.

  14. Extreme ultraviolet spectra of highly ionized oxygen and fluorine

    NASA Technical Reports Server (NTRS)

    Pegg, D. J.; Griffin, P. M.; Haselton, H. H.; Laubert, R.; Mowat, J. R.; Thoe, R. S.; Peterson, R. S.; Sellin, I. A.

    1974-01-01

    The foil-excitation method has been used to study the extreme ultraviolet spectra of highly ionized oxygen and fluorine. Several previously unreported lines in heliumlike fluorine are reported and other newly reported lines in heliumlike oxygen have been measured to higher accuracy. Included in the measurements are certain heliumlike oxygen transitions of significance in interpretation of solar-flare spectral observations. The wavelength determinations are usually in good agreement with calculated results which includes relativistic corrections, but discrepancies arise when nonrelativistic calculations are used. A comparison of the present results and those recently obtained by theta-pinch and laser-induced plasma sources is made for both heliumlike and lithiumlike ions; a few discrepancies occur, with results in most cases in better agreement with relativistically corrected calculations. Certain unidentified lines in the spectra may be attributable to radiative transitions between quartet states of lithiumlike ions.

  15. Extreme ultraviolet response of a Tektronix 1024 x 1024 CCD

    NASA Astrophysics Data System (ADS)

    Moses, Daniel J.; Hochedez, Jean-Francois E.; Howard, Russell A.; Au, Benjamin D.; Wang, Dennis; Blouke, Morley

    1992-08-01

    The goal of the detector development program for the Solar and Heliospheric Spacecraft (SOHO) EUV Imaging Telescope (EIT) is an Extreme UltraViolet (EUV) CCD (Charge Coupled Device) camera. The Naval Research Lab (NRL) SOHO COD Group has developed a design for the EIT camera and is screening CCDs for flight application. Tektronix Inc. have fabricated 1024x1024 CCDs for the EIT program. As a part of the CCD screening effort the quantum efficiency (QE) of a prototype CCD has been measured in the NRL EUV laboratory over the wavelength range of 256 to 735 Angstroms. A simplified model has been applied to these QE measurements to illustrate the relevant physical processes that determine the performance of the detector.

  16. A Penning discharge source for extreme ultraviolet calibration

    NASA Technical Reports Server (NTRS)

    Finley, David S.; Jelinsky, Patrick; Bowyer, Stuart; Malina, Roger F.

    1986-01-01

    A Penning discharge lamp for use in the calibration of instruments and components for the extreme ultraviolet has been developed. This source is sufficiently light and compact to make it suitable for mounting on the movable slit assembly of a grazing incidence Rowland circle monochromator. Because this is a continuous discharge source, it is suitable for use with photon counting detectors. Line radiation is provided both by the gas and by atoms sputtered off the interchangeable metal cathodes. Usable lines are produced by species as highly ionized as Ne IV and Al V. The wavelength coverage provided is such that a good density of emission lines is available down to wavelengths as short as 100A. This source fills the gap between 100 and 300A, which is inadequately covered by the other available compact continuous radiation sources.

  17. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength.

    PubMed

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-01-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam. PMID:27501749

  18. The extreme ultraviolet spectroscope for planetary science, EXCEED

    NASA Astrophysics Data System (ADS)

    Yoshioka, K.; Murakami, G.; Yamazaki, A.; Tsuchiya, F.; Kagitani, M.; Sakanoi, T.; Kimura, T.; Uemizu, K.; Uji, K.; Yoshikawa, I.

    2013-09-01

    The extreme ultraviolet spectroscope EXtrem ultraviolet spetrosCope for ExosphEric Dynamics (EXCEED) on board the SPRINT-A mission will be launched in the summer of 2013 by the new Japanese solid propulsion rocket Epsilon as its first attempt, and it will orbit around the Earth with an orbital altitude of around 1000 km. EXCEED is dedicated to and optimized for observing the terrestrial planets Mercury, Venus and Mars, as well as Jupiter for several years. The instrument consists of an off axis parabolic entrance mirror, switchable slits with multiple filters and shapes, a toroidal grating, and a photon counting detector, together with a field of view guiding camera. The design goal is to achieve a large effective area but with high spatial and spectral resolution. In this paper, the performance of each optical component will be described as determined from the results of test evaluation of flight models. In addition, the results of the optical calibration of the overall instrument are also shown. As a result, the spectral resolution of EXCEED is found to be 0.3-0.5 nm Full Width at Half Maximum (FWHM) over the entire spectral band (52-148 nm) and the spatial resolution achieve was 10". The evaluated effective area is around 3 cm2. Based on these specifications, the possibility of EXCEED detecting atmospheric ions or atoms around Mercury, Venus, and Mars will be discussed. In addition, we estimate the spectra that might be detected from the Io plasma torus around Jupiter for various hypothetical plasma parameters.

  19. Impurity Monitoring on NSTX-U with Three New Extreme Ultraviolet Spectrometers

    NASA Astrophysics Data System (ADS)

    Weller, M. E.; Beiersdorfer, P.; Soukhanovskii, V. A.; Magee, E. W.; Rognlien, T. D.; Stratton, B. C.

    2015-11-01

    The National Spherical Torus Experiment - Upgrade (NSTX-U) is a significant advancement from NSTX offering increased toroidal field, plasma current, and neutral beam injector input power. Due to these improvements generating more intense plasma conditions, impurities penetrating into the core could also be enhanced, despite efforts to improve wall conditioning (bake out, boronization, and lithium evaporation). To monitor and study these impurities, three extreme ultraviolet (EUV) spectrometers have been implemented on NSTX-U. All three are flat field grazing incident spectrometers capable of capturing time-resolved data to about 5.0 ms. Two of the spectrometers, the X-ray and Extreme Ultraviolet Spectrometer (XEUS, 5 - 65 Å) the Long-Wavelength and Extreme Ultraviolet Spectrometer (LoWEUS, 190 - 440 Å) were previously implemented on NSTX. The third has been dubbed the Metal Monitor and Lithium Spectrometer Assembly (MonaLisa, 50 - 220 Å). A new laser blow-off (LBO) system has also been developed in conjuncture with the spectrometers to introduce low and high-Z elements to study core impurity transport. The three spectrometers, along with the new LBO system, provide a unique opportunity to attain highly resolved spectra of impurities from 5 - 440 Å with time-resolution. This work was performed under the auspices of the US Department of Energy under DE-AC52-07NA27344 and DE-AC02- 09CH11466.

  20. Bright high-repetition-rate source of narrowband extreme-ultraviolet harmonics beyond 22 eV

    SciTech Connect

    Wang, He; Xu, Yiming; Ulonska, Stefan; Robinson, Joseph S.; Ranitovic, Predrag; Kaindl, Robert A.

    2015-06-11

    Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. In this article, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 1013 s-1 is generated at 22.3 eV, with 5 × 10-5 conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Finally, spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications.

  1. Bright high-repetition-rate source of narrowband extreme-ultraviolet harmonics beyond 22 eV

    PubMed Central

    Wang, He; Xu, Yiming; Ulonska, Stefan; Robinson, Joseph S.; Ranitovic, Predrag; Kaindl, Robert A.

    2015-01-01

    Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. Here, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 1013 s−1 is generated at 22.3 eV, with 5 × 10−5 conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications. PMID:26067922

  2. An operations and command systems for the extreme ultraviolet explorer

    NASA Technical Reports Server (NTRS)

    Muscettola, Nicola; Korsmeyer, David J.; Olson, Eric C.; Wong, Gary

    1994-01-01

    About 40% of the budget of a scientific spacecraft mission is usually consumed by Mission Operations & Data Analysis (MO&DA) with MO driving these costs. In the current practice, MO is separated from spacecraft design and comes in focus relatively late in the mission life cycle. As a result, spacecraft may be designed that are very difficult to operate. NASA centers have extensive MO expertise but often lessons learned in one mission are not exploited for other parallel or future missions. A significant reduction of MO costs is essential to ensure a continuing and growing access to space for the scientific community. We are addressing some of these issues with a highly automated payload operations and command system for an existing mission, the Extreme Ultraviolet Explorer (EUVE). EUVE is currently operated jointly by the Goddard Space Flight Center (GSFC), responsible for spacecraft operations, and the Center for Extreme Ultraviolet Astrophysics (CEA) of the University of California, Berkeley, which controls the telescopes and scientific instruments aboard the satellite. The new automated system is being developed by a team including personnel from the NASA Ames Research Center (ARC), the Jet Propulsion Laboratory (JPL) and the Center for EUV Astrophysics (CEA). An important goal of the project is to provide AI-based technology that can be easily operated by nonspecialists in AI. Another important goal is the reusability of the techniques for other missions. Models of the EUVE spacecraft need to be built both for planning/scheduling and for monitoring. In both cases, our modeling tools allow the assembly of a spacecraft model from separate sub-models of the various spacecraft subsystems. These sub-models are reusable; therefore, building mission operations systems for another small satellite mission will require choosing pre-existing modules, reparametrizing them with respect to the actual satellite telemetry information, and reassembling them in a new model. We

  3. Properites of ultrathin films appropriate for optics capping layers in extreme ultraviolet lithography (EUVL)

    SciTech Connect

    Bajt, S; Edwards, N V; Madey, T E

    2007-06-25

    The contamination of optical surfaces by irradiation shortens optics lifetime and is one of the main concerns for optics used in conjunction with intense light sources, such as high power lasers, 3rd and 4th generation synchrotron sources or plasma sources used in extreme ultraviolet lithography (EUVL) tools. This paper focuses on properties and surface chemistry of different materials, which as thin layers, could be used as capping layers to protect and extend EUVL optics lifetime. The most promising candidates include single element materials such as ruthenium and rhodium, and oxides such as TiO{sub 2} and ZrO{sub 2}.

  4. Coherent extreme ultraviolet light amplification by strong-field-enhanced forward scattering.

    PubMed

    Serrat, Carles

    2013-09-27

    We theoretically study the response of He atoms exposed simultaneously to an intense IR pulse and a weak extreme ultraviolet (XUV) pulse with photon energies far from the principal atomic He resonances. We find that XUV forward scattering from the nonstationary electronic wave packet promoted by the intense IR driving field is strongly enhanced as compared with the normal weak scattering from bound or free electrons. Based on this effect, we predict that large amplification of XUV radiation can be achieved in the cutoff spectral region of high-harmonic generation in He gas. PMID:24116781

  5. Characterization of electrostatic chucks for extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Mulholland, Tom C.; Zeuske, Jacob R.; Vukkadala, Pradeep; Engelstad, Roxann L.

    2009-03-01

    The use of an electrostatic chuck to support and flatten an extreme ultraviolet (EUV) mask during scanning exposure will be a critical component to meet the stringent requirements on image placement errors in the sub-30-nm regime. Consequently, the ability to predict the response of the mask during e-chucking is necessary for the design and implementation of the e-chuck system. This research focuses on characterizing the coefficient of friction between the EUV reticle and the dielectric material of the chuck. A customized tool was constructed to test chuck and reticle samples both in air and in a vacuum chamber. Studies were conducted to identify the friction coefficient at various chucking pressures and to examine the effects of wear caused by repeated measurements on the same location of the reticle surface. All experiments were performed in a cleanroom environment. Results of the friction testing illustrate the range of values to expect for typical EUV reticles and chucks. Finite element (FE) modeling was then used to illustrate the effects of friction on the overall capability of the chuck to flatten the mask. Additional FE simulations demonstrated the magnitude of the friction force needed to ensure that the reticle would not slip during the acceleration / deceleration loading seen in the scanning exposure process.

  6. Four-mirror extreme ultraviolet (EUV) lithography projection system

    DOEpatents

    Cohen, Simon J; Jeong, Hwan J; Shafer, David R

    2000-01-01

    The invention is directed to a four-mirror catoptric projection system for extreme ultraviolet (EUV) lithography to transfer a pattern from a reflective reticle to a wafer substrate. In order along the light path followed by light from the reticle to the wafer substrate, the system includes a dominantly hyperbolic convex mirror, a dominantly elliptical concave mirror, spherical convex mirror, and spherical concave mirror. The reticle and wafer substrate are positioned along the system's optical axis on opposite sides of the mirrors. The hyperbolic and elliptical mirrors are positioned on the same side of the system's optical axis as the reticle, and are relatively large in diameter as they are positioned on the high magnification side of the system. The hyperbolic and elliptical mirrors are relatively far off the optical axis and hence they have significant aspherical components in their curvatures. The convex spherical mirror is positioned on the optical axis, and has a substantially or perfectly spherical shape. The spherical concave mirror is positioned substantially on the opposite side of the optical axis from the hyperbolic and elliptical mirrors. Because it is positioned off-axis to a degree, the spherical concave mirror has some asphericity to counter aberrations. The spherical concave mirror forms a relatively large, uniform field on the wafer substrate. The mirrors can be tilted or decentered slightly to achieve further increase in the field size.

  7. Extreme ultraviolet observations from the voyager 2 encounter with saturn.

    PubMed

    Sandel, B R; Shemansky, D E; Broadfoot, A L; Holberg, J B; Smith, G R; McConnell, J C; Strobel, D F; Atreya, S K; Donahue, T M; Moos, H W; Hunten, D M; Pomphrey, R B; Linick, S

    1982-01-29

    Combined analysis of helium (584 angstroms) airglow and the atmospheric occultations of the star delta Scorpii imply a vertical mixing parameter in Saturn's upper atmosphere of K (eddy diffusion coefficient) approximately 8 x 10(7) square centimeters per second, an order of magnitude more vigorous than mixing in Jupiter's upper atmosphere. Atmospheric H(2) band absorption of starlight yields a preliminary temperature of 400 K in the exosphere and a temperature near the homopause of approximately 200 K. The energy source for the mid-latitude H(2) band emission still remains a puzzle. Certain auroral emissions can be fully explained in terms of electron impact on H(2), and auroral morphology suggests a link between the aurora and the Saturn kilometric radiation. Absolute optical depths have been determined for the entire C ring andparts of the A and B rings. A new eccentric ringlet has been detected in the C ring. The extreme ultraviolet reflectance of the rings is fairly uniform at 3.5 to 5 percent. Collisions may control the distribution of H in Titan's H torus, which has a total vertical extent of approximately 14 Saturn radii normal to the orbit plane. PMID:17771276

  8. Smoothing of Diamond-Turned Substrates for Extreme Ultraviolet Illuminators

    SciTech Connect

    Soufli, R; Spiller, E; Schmidt, M A; Robinson, J C; Baker, S L; Ratti, S; Johnson, M A; Gullikson, E M

    2003-11-13

    Condenser optics in extreme ultraviolet lithography (EUVL) systems are subjected to frequent replacement as they are positioned close to the illumination source, where increased heating and contamination occur. In the case of aspherical condenser elements made by optical figuring/finishing, their replacement can be very expensive (several hundred thousand dollars). One approach to this problem would be to manufacture inexpensive illuminator optics that meet all required specifications and could be replaced at no substantial cost. Diamond-turned metal substrates are a factor of 100 less expensive than conventional aspherical substrates but have insufficient finish, leading to unacceptably low EUV reflectance after multilayer coating. In this work it is shown that, by applying a smoothing film prior to multilayer coating, the high spatial frequency roughness of a diamond-turned metal substrate is reduced from 1.76 to 0.27 nm rms while the figure slope error is maintained at acceptable levels. Metrology tests performed at various stages of the fabrication of the element demonstrated that it satisfied all critical figure and finish specifications as illuminator. Initial experimental results on the stability and performance of the optic under a real EUVL plasma source environment show no accelerated degradation when compared to conventional substrates.

  9. Laser produced plasma for efficient extreme ultraviolet light sources

    SciTech Connect

    Donnelly, Tony; Cummins, Thomas; O' Gorman, Colm; Li Bowen; Harte, Colm S.; O'Reilly, Fergal; Sokell, Emma; Dunne, Padraig; O'Sullivan, Gerry

    2012-05-25

    Extreme ultraviolet emission from laser produced plasma and their relevance to EUV source development is discussed. The current state of the field for Sn LPP sources operating at 13.5 nm is described and initial results are given for EUV emission from CO{sub 2} laser irradiation of a bulk Sn target. A maximum conversion efficiency of 1.7% has been measured and the influence of the CO{sub 2} laser temporal profile on the CE is discussed. A double pulse irradiation scheme is shown to increase CE up to a maximum value of 2.1% for an optimum prepulse - pulse delay of 150 ns. The emergence of a new EUVL source wavelength at 6.7 nm based on Gd and Tb LPPs has been outlined. An initial experiment investigating picosecond laser irradiation as a means to produce strong 6.7 nm emission from a Gd{sub 2}O{sub 3} target has been performed and verified.

  10. The Extreme Ultraviolet (EUV) Instrument for the MAVEN Mission

    NASA Technical Reports Server (NTRS)

    Chamberlin, Phillip C.

    2012-01-01

    The Mars Atmosphere and Volatile Evolution Mission (MAVEN) will explore the variability in the planet's upper atmosphere and ionosphere that is dominated by interactions with the sun, specifically the high-energy photons in the soft X-ray and extreme ultraviolet wavelengths as well as interactions with the solar wind. Scientists will use MAVEN data to determine the current loss rate of volatile compounds from the Mars atmosphere, then extrapolate back in time in order to give historical estimations of state of the Mars atmosphere and climate, its ability to sustain liquid water, and the potential for the Martian habitability. The EUV instrument is critical in measuring the Space Weather driver of this atmospheric variability. It will directly observe a three EUV wavelength ranges and their variability due to solar flares (time scales of seconds to hours) as well as active region evolution (months), which will then act as proxies for a model to determine the entire 0.1-200 nm solar spectrum at all times during the MAVEN mission. These EUV measurements and models results will compliment the other instruments that will provide direct in-situ as well as remote sensing observations of the Martian atmospheric response to this solar driver. This presentation will be an introduction of this instrument and its science measurements and goals to the larger community, as well as a status report on its progress.

  11. The joint astrophysical plasmadynamic experiment extreme ultraviolet spectrometer: resolving power

    NASA Astrophysics Data System (ADS)

    Berendse, F. B.; Cruddace, R. G.; Kowalski, M. P.; Yentis, D. J.; Hunter, W. R.; Fritz, G. G.; Siegmund, O.; Heidemann, K.; Lenke, R.; Seifert, A.; Barbee, T. W., Jr.

    2006-06-01

    The Joint astrophysical Plasmadynamic EXperiment (J-PEX) is a high-resolution extreme ultraviolet (EUV) spectrometer (220-245 Å) used for the study of white dwarf atmospheres. Significant improvements have been achieved in both the normal-incidence gratings and the focal-plane detector since its first successful sounding rocket flight in 2001. The spherical laminar gratings have been replaced by paraboloidal gratings. The substrates of the new gratings have measured slope errors less than 0.35 arcsec. The gratings were recorded holographically and the rulings transferred into the silica substrates by ion etching. This procedure was followed by polymer overcoat to reduce the blaze angle of the groove profile. The detector uses microchannel plates with 6 μm pores and a cross-strip anode, providing 17.9 μm resolution in the dispersion direction. The detector employs a KBr photocathode with a projected efficiency of 0.24 at 256 Å. Using ray tracing simulations, we predict the resolving power expected from the spectrometer during upcoming EUV calibrations with a He II discharge source.

  12. Expected extreme ultraviolet spectrum of the lunar surface

    SciTech Connect

    Edwards, B.C.; Priedhorsky, W.C.; Smith, B.W. )

    1991-11-01

    The moon was recently observed to be a source of very soft x-ray emission. The emission was most intense at wavelengths longer than 62 {angstrom} and was attributed to Thomson scattering of solar x-rays. This observation prompted the authors to study the emissions expected from the lunar surface in the wavelength range between 90 and 500 {angstrom}. Photons in this wavelength range scatter inefficiently. Instead, the solar x-rays are absorbed in the first several microns of lunar regolith. The absorbed x-rays can excite the surface elements and result in fluorescent emission. The authors find that much of the L- and M-shell extreme ultraviolet fluorescence, in the wavelength range between 90 and 500 {angstrom}, have higher peak intensities than the scattered solar spectrum. The total integrated fluorescent emission is also higher than the total scattered solar radiation. The L-shell fluorescent radiation can be an indicator of the surface abundances of Si, Al, Mg and other major lunar elements.

  13. Kr photoionized plasma induced by intense extreme ultraviolet pulses

    NASA Astrophysics Data System (ADS)

    Bartnik, A.; Wachulak, P.; Fiedorowicz, H.; Skrzeczanowski, W.

    2016-04-01

    Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.

  14. Extreme Ultraviolet Explorer Right Angle Program observations of cool stars

    NASA Astrophysics Data System (ADS)

    Christian, D. J.; Drake, J. J.; Mathioudakis, M.

    1998-01-01

    The Extreme Ultraviolet Explorer (EUVE) Right Angle Program (RAP) obtains photometric data in four bands centered at 100 (Lexan/B), 200 (Al/Ti/C), 400 (Ti/Sb/Al), and 550 (Sn/SiO) during pointed spectroscopic observations. RAP observations are up to 20 times more sensitive than those in the EUVE all-sky survey. We present RAP observations of two dozen late-type stars. We derive surface fluxes from the Lexan/B and Al/Ti/C count rates and cataloged ROSAT Position Sensitive Proportional Counter (PSPC) data. The EUVE surface fluxes are reasonably correlated with surface fluxes calculated from PSPC measurements. The time variability of the sources has been examined. Most of the sources show no significant variability at the 99 percent confidence level. Flares were detected from the K7 V star Melotte 25 VA 334, the K3 V star V834 Tau (HD 29697), and the K3 + K8 Hyades binary BD +22669. The BD +22669 count rate at the peak of the flare is a factor of 6 higher than the quiescent count rate, with a peak Lexan/B luminosity of 7.9 1029 ergs/s. The V834 Tau flare was detected in both Lexan/B and Al/Ti/C bands. The peak luminosity of the flare is 1.6 1029 and 8 1028 ergs/s for Lexan/B and Al/Ti/C, respectively.

  15. Imaging performance and test of extreme ultraviolet telescope

    NASA Astrophysics Data System (ADS)

    Yang, Lin; Cui, Tiangang; Chen, Bo

    2009-08-01

    The Extreme Ultraviolet Telescope (EUT) is composed of a set of four individual normal incidence multilayer-coated telescopes that obtained selected spectrum bandpass (131 A-304 A) of the solar atmosphere. Before the launch, it is necessary to calibrate the imaging performance of EUT. We build a test system for EUT by two ways. Resolution test was performed using 1951 Standard Air Force High Resolution Test target, and the optical resolution limits down to 0.96arc-second at 404.7nm. A pinhole as a target placed on the focal point of a collimator is illuminated mercury lump. The intensity distribution is obtained by knife-edge scanning with low noise photon-counting detector. The slope of the knife-edge scan is equal to the value of the line spread function (LSF). Based on these measurement, we calculate the e modulation transfer function, which is highly closed to the simulation result of zemax. The experiment result indicates that the test system works well. For further work, the working wavelength test will be done with the help of those experiment results.

  16. Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

    NASA Astrophysics Data System (ADS)

    Passarelli, James; Murphy, Michael; Re, Ryan Del; Sortland, Miriam; Hotalen, Jodi; Dousharm, Levi; Fallica, Roberto; Ekinci, Yasin; Neisser, Mark; Freedman, Daniel A.; Brainard, Robert L.

    2015-10-01

    We have developed organometallic carboxylate compounds [RnM)] capable of acting as negative-tone extreme ultraviolet (EUV) resists. The most sensitive of these resists contain antimony, three R-groups and two carboxylate groups, and carboxylate groups with polymerizable olefins (e.g., acrylate, methacrylate, or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of the molecules of the type RnM) where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O2CR‧). The sensitivity of these resists was evaluated using Emax or dose to maximum resist thickness after exposure and development. We found that the greatest predictor of sensitivity of the RnSb) resists is their level of polymerizable olefins. We mathematically define the polymerizable olefin loading (POL) as the ratio of the number of olefins versus the number of nonhydrogen atoms. Linear and log plots of Emax versus POL for a variety of molecules of the type R3Sb) lend insight into the behavior of these resists.

  17. Imaging characteristics of the Extreme Ultraviolet Explorer microchannel plate detectors

    NASA Technical Reports Server (NTRS)

    Vallerga, J. V.; Kaplan, G. C.; Siegmund, O. H. W.; Lampton, M.; Malina, R. F.

    1989-01-01

    The Extreme Ultraviolet Explorer (EUVE) satellite will conduct an all-sky survey over the wavelength range from 70 A to 760 A using four grazing-incidence telescopes and seven microchannel-plate (MCP) detectors. The imaging photon-counting MCP detectors have active areas of 19.6 cm2. Photon arrival position is determined using a wedge-and-strip anode and associated pulse-encoding electronics. The imaging characteristics of the EUVE flight detectors are presented including image distortion, flat-field response, and spatial differential nonlinearity. Also included is a detailed discussion of image distortions due to the detector mechanical assembly, the wedge-and-strip anode, and the electronics. Model predictions of these distortions are compared to preflight calibration images which show distortions less than 1.3 percent rms of the detector diameter of 50 mm before correction. The plans for correcting these residual detector image distortions to less than 0.1 percent rms are also presented.

  18. Extreme and far ultraviolet astronomy from Voyagers 1 and 2

    NASA Technical Reports Server (NTRS)

    Holberg, J. B.

    1990-01-01

    The instrumental characteristics, observational capabilities and scientific results of the Voyager 1 and 2 ultraviolet spectrometers are reviewed. These instruments provide current and ongoing access to low resolution spectra for a wide variety of astronomical sources in the 500 to 1700 A band. Observations of the brightest OB stars and hot subluminous stars as faint as V = 15 mag, are possible. In the EUV, at wavelengths shortward of 900 A, several new sources have been detected and a host of potential sources ruled out. In the far UV, particularly at wavelengths between 900 and 1200 A, Voyager is capable of observing a wide range of stellar and non-stellar sources. Such observations can often provide a valuable complement to IUE and other data sets at longer wavelengths. The Voyager spectrometers have proved remarkably stable photon counting instruments, capable of extremely long integration times. The long integration times, relatively large field of view, and location in the outer solar system also provide an ideal platform for observations of sources of faint diffuse emission, such as nebulae and the general sky background.

  19. Low extreme-ultraviolet luminosities impinging on protoplanetary disks

    SciTech Connect

    Pascucci, I.; Hendler, N. P.; Ricci, L.; Gorti, U.; Hollenbach, D.; Brooks, K. J.; Contreras, Y.

    2014-11-01

    The amount of high-energy stellar radiation reaching the surface of protoplanetary disks is essential to determine their chemistry and physical evolution. Here, we use millimetric and centimetric radio data to constrain the extreme-ultraviolet (EUV) luminosity impinging on 14 disks around young (∼2-10 Myr) sun-like stars. For each object we identify the long-wavelength emission in excess to the dust thermal emission, attribute that to free-free disk emission, and thereby compute an upper limit to the EUV reaching the disk. We find upper limits lower than 10{sup 42} photons s{sup –1} for all sources without jets and lower than 5 × 10{sup 40} photons s{sup –1} for the three older sources in our sample. These latter values are low for EUV-driven photoevaporation alone to clear out protoplanetary material in the timescale inferred by observations. In addition, our EUV upper limits are too low to reproduce the [Ne II] 12.81 μm luminosities from three disks with slow [Ne II]-detected winds. This indicates that the [Ne II] line in these sources primarily traces a mostly neutral wind where Ne is ionized by 1 keV X-ray photons, implying higher photoevaporative mass loss rates than those predicted by EUV-driven models alone. In summary, our results suggest that high-energy stellar photons other than EUV may dominate the dispersal of protoplanetary disks around sun-like stars.

  20. Low Extreme-ultraviolet Luminosities Impinging on Protoplanetary Disks

    NASA Astrophysics Data System (ADS)

    Pascucci, I.; Ricci, L.; Gorti, U.; Hollenbach, D.; Hendler, N. P.; Brooks, K. J.; Contreras, Y.

    2014-11-01

    The amount of high-energy stellar radiation reaching the surface of protoplanetary disks is essential to determine their chemistry and physical evolution. Here, we use millimetric and centimetric radio data to constrain the extreme-ultraviolet (EUV) luminosity impinging on 14 disks around young (~2-10 Myr) sun-like stars. For each object we identify the long-wavelength emission in excess to the dust thermal emission, attribute that to free-free disk emission, and thereby compute an upper limit to the EUV reaching the disk. We find upper limits lower than 1042 photons s-1 for all sources without jets and lower than 5 × 1040 photons s-1 for the three older sources in our sample. These latter values are low for EUV-driven photoevaporation alone to clear out protoplanetary material in the timescale inferred by observations. In addition, our EUV upper limits are too low to reproduce the [Ne II] 12.81 μm luminosities from three disks with slow [Ne II]-detected winds. This indicates that the [Ne II] line in these sources primarily traces a mostly neutral wind where Ne is ionized by 1 keV X-ray photons, implying higher photoevaporative mass loss rates than those predicted by EUV-driven models alone. In summary, our results suggest that high-energy stellar photons other than EUV may dominate the dispersal of protoplanetary disks around sun-like stars.

  1. Extreme ultraviolet multilayer defect analysis and geometry reconstruction

    NASA Astrophysics Data System (ADS)

    Xu, Dongbo; Evanschitzky, Peter; Erdmann, Andreas

    2016-01-01

    This paper proposes a method for the characterization of multilayer defects from extreme ultraviolet (EUV) projection images at different focus positions. The transport-of-intensity equation is applied to retrieve the phase distribution of the reflected light in the vicinity of the defect. The defect-induced intensity and phase modifications and their dependency from defect geometry parameters are analyzed by several selected optical properties of multilayer defect. To reconstruct the defect geometry parameters from the intensity and phase of a defect, a principal component analysis (PCA) is employed to parameterize the intensity and phase distributions into principal component coefficients. In order to construct the base functions of the PCA, a combination of a reference multilayer defect and appropriate pupil filters is introduced to obtain the designed sets of intensity and phase distributions. Finally, an artificial neural network is applied to correlate the principal component coefficients of the intensity and the phase of the defect with the defect geometry parameters and to reconstruct the unknown defect geometry parameters. The performance of the proposed approach is evaluated both for mask blank defects and for defects in the vicinity of an absorber pattern.

  2. Extreme-ultraviolet ultrafast ARPES at high repetition rates

    NASA Astrophysics Data System (ADS)

    Buss, Jan; Wang, He; Xu, Yiming; Stoll, Sebastian; Zeng, Lingkun; Ulonska, Stefan; Denlinger, Jonathan; Hussain, Zahid; Jozwiak, Chris; Lanzara, Alessandra; Kaindl, Robert

    Time- and angle-resolved photoemission spectroscopy (trARPES) represents a powerful approach to resolve the electronic structure and quasiparticle dynamics in complex materials, yet is often limited in either momentum space (incident photon energy), probe sensitivity (pulse repetition rate), or energy resolution. We demonstrate a novel table-top trARPES setup that combines a bright 50-kHz source of narrowband, extreme ultraviolet (XUV) pulses at 22.3 eV with UHV photoemission instrumentation to sensitively access dynamics for a large momentum space. The output of a high-power Ti:sapphire amplifier is split to provide the XUV probe and intense photoexcitation (up to mJ/cm2) . A vacuum beamline delivers spectral and flux characterization, differential pumping, as well as XUV beam steering and toroidal refocusing onto the sample with high incident flux of 3x1011 ph/s. Photoemission studies are carried out in a customized UHV chamber equipped with a hemispherical analyzer (R4000), six-axis sample cryostat, and side chambers for sample loading, storage and preparation. An ARPES energy resolution down to 70 meV with the direct XUV output is demonstrated. We will discuss initial applications of this setup including Fermi surface mapping and trARPES of complex materials.

  3. Contamination control approach for the Extreme Ultraviolet Explorer satellite instrumentation

    NASA Technical Reports Server (NTRS)

    Mrowka, Stan; Jelinsky, Sharon; Jelinsky, Patrick; Malina, Roger F.

    1987-01-01

    The Extreme Ultraviolet Explorer will perform an all-sky survey and spectroscopic observations over the wavelength range 80-900A. Hydrocarbon and particulate contamination will potentially affect the throughput and signal to noise ratio of the signal detected by the instruments. A witness sample program is here used to investigate and monitor the effects of specific contaminants on EUV reflectivity. Witness samples were intentionally contaminated with thin layers of pump oil. An oil layer 150 A thick was applied and found to evaporate over 8 hours. The EUV reflectivity and imaging properties were then measured and found to be acceptable for grazing angles between 5 and 30 deg. In a second test, layers 500 A thick were deposited and then allowed to evaporate in vacuum; once the oil had evaporated to at least 350 A, the final sample reflectivity was degraded less than 10 percent, but the image was degraded severely by scattering. An outline of the contamination control program is also presented.

  4. Extreme Ultraviolet Spectra of Solar Flares from the Extreme Ultraviolet Spectroheliograph SPIRIT Onboard the CORONAS-F Satellite

    NASA Astrophysics Data System (ADS)

    Shestov, S.; Reva, A.; Kuzin, S.

    2014-01-01

    We present detailed extreme ultraviolet (EUV) spectra of four large solar flares: M5.6, X1.3, X3.4, and X17 classes in the spectral ranges 176-207 Å and 280-330 Å. These spectra were obtained by the slitless spectroheliograph SPIRIT onboard the CORONAS-F satellite. To our knowledge, these are the first detailed EUV spectra of large flares obtained with a spectral resolution of ~0.1 Å. We performed a comprehensive analysis of the obtained spectra and provide identification of the observed spectral lines. The identification was performed based on the calculation of synthetic spectra (the CHIANTI database was used), with simultaneous calculations of the differential emission measure (DEM) and density of the emitting plasma. More than 50 intense lines are present in the spectra that correspond to a temperature range of T = 0.5-16 MK most of the lines belong to Fe, Ni, Ca, Mg, and Si ions. In all the considered flares, intense hot lines from Ca XVII, Ca XVIII, Fe XX, Fe XXII, and Fe XXIV are observed. The calculated DEMs have a peak at T ~ 10 MK. The densities were determined using Fe XI-Fe XIII lines and averaged 6.5 × 109 cm-3. We also discuss the identification, accuracy, and major discrepancies of the spectral line intensity prediction.

  5. Extreme ultraviolet spectra of solar flares from the extreme ultraviolet spectroheliograph SPIRIT onboard the CORONAS-F satellite

    SciTech Connect

    Shestov, S.; Kuzin, S.; Reva, A.

    2014-01-01

    We present detailed extreme ultraviolet (EUV) spectra of four large solar flares: M5.6, X1.3, X3.4, and X17 classes in the spectral ranges 176-207 Å and 280-330 Å. These spectra were obtained by the slitless spectroheliograph SPIRIT onboard the CORONAS-F satellite. To our knowledge, these are the first detailed EUV spectra of large flares obtained with a spectral resolution of ∼0.1 Å. We performed a comprehensive analysis of the obtained spectra and provide identification of the observed spectral lines. The identification was performed based on the calculation of synthetic spectra (the CHIANTI database was used), with simultaneous calculations of the differential emission measure (DEM) and density of the emitting plasma. More than 50 intense lines are present in the spectra that correspond to a temperature range of T = 0.5-16 MK; most of the lines belong to Fe, Ni, Ca, Mg, and Si ions. In all the considered flares, intense hot lines from Ca XVII, Ca XVIII, Fe XX, Fe XXII, and Fe XXIV are observed. The calculated DEMs have a peak at T ∼ 10 MK. The densities were determined using Fe XI-Fe XIII lines and averaged 6.5 × 10{sup 9} cm{sup –3}. We also discuss the identification, accuracy, and major discrepancies of the spectral line intensity prediction.

  6. Spectroscopy of the far and extreme ultraviolet dayglow

    NASA Astrophysics Data System (ADS)

    Bowers, C. W.

    Researchers have designed, built and flown in a sounding rocket payload, a spectrograph with approx. 2 angstrom resolution from 850 angstroms to 1850 angstroms obtaining the highest resolution, broad wavelength coverage UV dayglow spectrum to date. This instrument utilizes a newly developed photon counting detector consisting of an ultraviolet-to-visible-light image intensifier with two microchannel plates in a tandem arrangement followed by a phosphor coated on the face of a fiber optics output bundle. Light generated in the phosphor by electron pulses produced by the MCP stack is transmitted to photodiode array with 1024 independent photodiodes. The broad light pulses generated by the intensifier were detected by the photodiode array. This flight data was transmitted to the ground and centroided, recovering the spectrograph resolution of approx. 2 angstroms. The vacuum spectrograph contains an osmium coated holographic f/2 concave diffraction grating, baffled to f/4 for flight. A movable slit wheel mechanism provides a vacuum seal, which is broken during flight as the entrance slit is moved into position. The UV dayglow spectrum obtained is presented and tentative identification of most of the emission features is made.

  7. Spectral catalogue of the intermediate ionization states of iron in the extreme ultraviolet

    SciTech Connect

    Beiersdorfer, P.; Utter, S.B.; Brown, G.V.

    1998-05-13

    Using precisely controlled laboratory conditions we have begun to establish a spectral catalogue of the intermediate ionization states of iron, Fe IX - Fe XXIV, in the extreme ultraviolet. The measurements are being performed in support of the development of reliable modeling codes for the analysis of data from the Extreme Ultraviolet Explorer and future space astrophysics missions sensitive to extreme ultraviolet radiation. They aim to resolve the controversies surrounding the short-wavelength spectra of stellar coronae. Preliminary measurements showing the wealth of iron lines in the 50-120 {Angstrom} region are presented.

  8. Analysis of extreme ultraviolet spectra from laser produced rhenium plasmas

    NASA Astrophysics Data System (ADS)

    Wu, Tao; Higashiguchi, Takeshi; Li, Bowen; Suzuki, Yuhei; Arai, Goki; Dinh, Thanh-Hung; Dunne, Padraig; O'Reilly, Fergal; Sokell, Emma; Liu, Luning; O'Sullivan, Gerry

    2015-08-01

    Extreme ultraviolet spectra of highly-charged rhenium ions were observed in the 1-7 nm region using two Nd:YAG lasers with pulse lengths of 150 ps and 10 ns, respectively, operating at a number of laser power densities. The maximum focused peak power density was 2.6 × 1014 W cm-2 for the former and 5.5 × 1012 W cm-2 for the latter. The Cowan suite of atomic structure codes and unresolved transition array (UTA) approach were used to calculate and interpret the emission properties of the different spectra obtained. The results show that n = 4-n = 4 and n = 4-n = 5 UTAs lead to two intense quasi-continuous emission bands in the 4.3-6.3 nm and 1.5-4.3 nm spectral regions. As a result of the different ion stage distributions in the plasmas induced by ps and ns laser irradiation the 1.5-4.3 nm UTA peak moves to shorter wavelength in the ps laser produced plasma spectra. For the ns spectrum, the most populated ion stage during the lifetime of this plasma that could be identified from the n = 4-n = 5 transitions was Re23+ while for the ps plasma the presence of significantly higher stages was demonstrated. For the n = 4-n = 4 4p64dN-4p54dN+1 + 4p64dN-14f transitions, the 4d-4f transitions contribute mainly in the most intense 4.7-5.5 nm region while the 4p-4d subgroup gives rise to a weaker feature in the 4.3-4.7 nm region. A number of previously unidentified spectral features produced by n = 4-n = 5 transitions in the spectra of Re XVI to Re XXXIX are identified.

  9. Solar extreme ultraviolet sensor and advanced langmuir probe

    NASA Technical Reports Server (NTRS)

    Voronka, N. R.; Block, B. P.; Carignan, G. R.

    1992-01-01

    For more than two decades, the staff of the Space Physics Research Laboratory (SPRL) has collaborated with the Goddard Space Flight Center (GSFC) in the design and implementation of Langmuir probes (LP). This program of probe development under the direction of Larry Brace of GSFC has evolved methodically with innovations to: improve measurement precision, increase the speed of measurement, and reduce the weight, size, power consumption and data rate of the instrument. Under contract NAG5-419 these improvements were implemented and are what characterize the Advanced Langmuir Probe (ALP). Using data from the Langmuir Probe on the Pioneer Venus Orbiter, Brace and Walter Hoegy of GSFC demonstrated a novel method of monitoring the solar extreme ultraviolet (EUV) flux. This led to the idea of developing a sensor similar to a Langmuir probe specifically designed to measure solar EUV (SEUV) that uses a similar electronics package. Under this contract, a combined instrument package of the ALP and SEUV sensor was to be designed, constructed, and laboratory tested. Finally the instrument was to be flight tested as part of sounding rocket experiment to acquire the necessary data to validate this method for possible use in future earth and planetary aeronomy missions. The primary purpose of this contract was to develop the electronics hardware and software for this instrument, since the actual sensors were suppied by GSFC. Due to budget constraints, only a flight model was constructed. These electronics were tested and calibrated in the laboratory, and then the instrument was integrated into the rocket payload at Wallops Flight Facility where it underwent environmental testing. After instrument recalibration at SPRL, the payload was reintegrated and launched from the Poker Flat Research Range near Fairbanks Alaska. The payload was successfully recovered and after refurbishment underwent further testing and developing to improve its performance for future use.

  10. Reconstruction of Solar Extreme Ultraviolet Flux 1740 - 2015

    NASA Astrophysics Data System (ADS)

    Svalgaard, Leif

    2016-08-01

    Solar extreme ultraviolet (EUV) radiation creates the conducting E-layer of the ionosphere, mainly by photo-ionization of molecular oxygen. Solar heating of the ionosphere creates thermal winds, which by dynamo action induce an electric field driving an electric current having a magnetic effect observable on the ground, as was discovered by G. Graham in 1722. The current rises and falls with the Sun, and thus causes a readily observable diurnal variation of the geomagnetic field, allowing us to deduce the conductivity and thus the EUV flux as far back as reliable magnetic data reach. High-quality data go back to the "Magnetic Crusade" of the 1830s and less reliable, but still usable, data are available for portions of the 100 years before that. J.R. Wolf and, independently, J.-A. Gautier discovered the dependence of the diurnal variation on solar activity, and today we understand and can invert that relationship to construct a reliable record of the EUV flux from the geomagnetic record. We compare that to the F_{10.7} flux and the sunspot number, and we find that the reconstructed EUV flux reproduces the F_{10.7} flux with great accuracy. On the other hand, it appears that the Relative Sunspot Number as currently defined is beginning to no longer be a faithful representation of solar magnetic activity, at least as measured by the EUV and related indices. The reconstruction suggests that the EUV flux reaches the same low (but non-zero) value at every sunspot minimum (possibly including Grand Minima), representing an invariant "solar magnetic ground state".

  11. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.

    PubMed

    Bogachev, S A; Chkhalo, N I; Kuzin, S V; Pariev, D E; Polkovnikov, V N; Salashchenko, N N; Shestov, S V; Zuev, S Y

    2016-03-20

    We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3  nm, λ=17-21  nm, λ=28-33  nm, and λ=58.4  nm. We found new material pairs, which will make new spaceborne experiments possible due to the high reflection efficiencies, spectral resolution, and long-term stabilities of the proposed multilayer coatings. In the spectral range λ=13  nm, Mo/Be multilayer mirrors were shown to demonstrate a better ratio of reflection efficiency and spectral resolution compared with the commonly used Mo/Si. In the spectral range λ=17-21  nm, a new multilayer structure Al/Si was proposed, which had higher spectral resolution along with comparable reflection efficiency compared with the commonly used Al/Zr multilayer structures. In the spectral range λ=30  nm, the Si/B4C/Mg/Cr multilayer structure turned out to best obey reflection efficiency and long-term stability. The B4C and Cr layers prevented mutual diffusion of the Si and Mg layers. For the spectral range λ=58  nm, a new multilayer Mo/Mg-based structure was developed; its reflection efficiency and long-term stability have been analyzed. We also investigated intrinsic stresses inherent for most of the multilayer structures and proposed possibilities for stress elimination. PMID:27140543

  12. Sources for beyond extreme ultraviolet lithography and water window imaging

    NASA Astrophysics Data System (ADS)

    O'Sullivan, Gerry; Li, Bowen; Dunne, Padraig; Hayden, Paddy; Kilbane, Deirdre; Lokasani, Ragava; Long, Elaine; Ohashi, Hayato; O'Reilly, Fergal; Sheil, John; Sheridan, Paul; Sokell, Emma; Suzuki, Chihiro; White, Elgiva; Higashiguchi, Takeshi

    2015-05-01

    Lithography tools are being built and shipped to semiconductor manufacturers for high volume manufacturing using extreme ultraviolet lithography (EUVL) at a wavelength of 13.5 nm. This wavelength is based on the availability of Mo/Si multilayer mirrors (MLMs) with a reflectivity of ˜70% at this wavelength. Moreover, the primary lithography tool manufacturer, ASML, has identified 6.x nm, where x˜7, as the wavelength of choice for so-called Beyond EUVL, based on the availability of La/B4C MLMs, with theoretical reflectance approaching 80% at this wavelength. The optimum sources have been identified as laser produced plasmas of Gd and Tb, as n = 4-n = 4 transitions in their ions emit strongly near this wavelength. However, to date, the highest conversion efficiency obtained, for laser to EUV energy emitted within the 0.6% wavelength bandwidth of the mirror is only 0.8%, pointing to the need to identify other potential sources or consider the selection of other wavelengths. At the same time, sources for other applications are being developed. Conventional sources for soft x-ray microscopy use H-like line emission from liquid nitrogen or carbon containing liquid jets which can be focused using zone plates. Recently the possibility of using MLMs with n = 4-n = 4 emission from a highly charged Bi plasma was proposed and subsequently the possibility of using Δn = 1 transitions in 3rd row transition elements was identified. All of these studies seek to identify spectral features that coincide with the reflectance characteristics of available MLMs, determine the conditions under which they are optimized and establish the maximum conversion efficiencies obtainable. Thus, there is a need for systematic studies of laser produced plasmas of a wide range of elements as some of the challenges are similar for all of these sources and some recent results will be presented.

  13. Extreme Ultraviolet Emission Lines of Iron Fe XI-XIII

    NASA Astrophysics Data System (ADS)

    Lepson, Jaan; Beiersdorfer, P.; Brown, G. V.; Liedahl, D. A.; Brickhouse, N. S.; Dupree, A. K.

    2013-04-01

    The extreme ultraviolet (EUV) spectral region (ca. 20--300 Å) is rich in emission lines from low- to mid-Z ions, particularly from the middle charge states of iron. Many of these emission lines are important diagnostics for astrophysical plasmas, providing information on properties such as elemental abundance, temperature, density, and even magnetic field strength. In recent years, strides have been made to understand the complexity of the atomic levels of the ions that emit the lines that contribute to the richness of the EUV region. Laboratory measurements have been made to verify and benchmark the lines. Here, we present laboratory measurements of Fe XI, Fe XII, and Fe XIII between 40-140 Å. The measurements were made at the Lawrence Livermore electron beam ion trap (EBIT) facility, which has been optimized for laboratory astrophysics, and which allows us to select specific charge states of iron to help line identification. We also present new calculations by the Hebrew University - Lawrence Livermore Atomic Code (HULLAC), which we also utilized for line identification. We found that HULLAC does a creditable job of reproducing the forest of lines we observed in the EBIT spectra, although line positions are in need of adjustment, and line intensities often differed from those observed. We identify or confirm a number of new lines for these charge states. This work was supported by the NASA Solar and Heliospheric Program under Contract NNH10AN31I and the DOE General Plasma Science program. Work was performed in part under the auspices of the Department of Energy by Lawrence Livermore National Laboratory under Contract DEAC52-07NA27344.

  14. NEW SOLAR EXTREME-ULTRAVIOLET IRRADIANCE OBSERVATIONS DURING FLARES

    SciTech Connect

    Woods, Thomas N.; Hock, Rachel; Eparvier, Frank; Jones, Andrew R.; Chamberlin, Phillip C.; Klimchuk, James A.; Didkovsky, Leonid; Judge, Darrell; Mariska, John; Warren, Harry; Schrijver, Carolus J.; Webb, David F.; Bailey, Scott; Tobiska, W. Kent

    2011-10-01

    New solar extreme-ultraviolet (EUV) irradiance observations from the NASA Solar Dynamics Observatory (SDO) EUV Variability Experiment provide full coverage in the EUV range from 0.1 to 106 nm and continuously at a cadence of 10 s for spectra at 0.1 nm resolution and even faster, 0.25 s, for six EUV bands. These observations can be decomposed into four distinct characteristics during flares. First, the emissions that dominate during the flare's impulsive phase are the transition region emissions, such as the He II 30.4 nm. Second, the hot coronal emissions above 5 MK dominate during the gradual phase and are highly correlated with the GOES X-ray. A third flare characteristic in the EUV is coronal dimming, seen best in the cool corona, such as the Fe IX 17.1 nm. As the post-flare loops reconnect and cool, many of the EUV coronal emissions peak a few minutes after the GOES X-ray peak. One interesting variation of the post-eruptive loop reconnection is that warm coronal emissions (e.g., Fe XVI 33.5 nm) sometimes exhibit a second large peak separated from the primary flare event by many minutes to hours, with EUV emission originating not from the original flare site and its immediate vicinity, but rather from a volume of higher loops. We refer to this second peak as the EUV late phase. The characterization of many flares during the SDO mission is provided, including quantification of the spectral irradiance from the EUV late phase that cannot be inferred from GOES X-ray diagnostics.

  15. Lamp for generating high power ultraviolet radiation

    DOEpatents

    Morgan, Gary L.; Potter, James M.

    2001-01-01

    The apparatus is a gas filled ultraviolet generating lamp for use as a liquid purifier. The lamp is powred by high voltage AC, but has no metallic electrodes within or in contact with the gas enclosure which is constructed as two concentric quartz cylinders sealed together at their ends with the gas fill between the cylinders. Cooling liquid is pumped through the volume inside the inner quartz cylinder where an electrically conductive pipe spaced from the inner cylinder is used to supply the cooling liquid and act as the high voltage electrode. The gas enclosure is enclosed within but spaced from a metal housing which is connected to operate as the ground electrode of the circuit and through which the treated fluid flows. Thus, the electrical circuit is from the central pipe, and through the cooling liquid, the gas enclosure, the treated liquid on the outside of the outer quartz cylinder, and to the housing. The high voltage electrode is electrically isolated from the source of cooling liquid by a length of insulated hose which also supplies the cooling liquid.

  16. Angular distribution of ions and extreme ultraviolet emission in laser-produced tin droplet plasma

    NASA Astrophysics Data System (ADS)

    Chen, Hong; Wang, Xinbing; Duan, Lian; Lan, Hui; Chen, Ziqi; Zuo, Duluo; Lu, Peixiang

    2015-05-01

    Angular-resolved ion time-of-flight spectra as well as extreme ultraviolet radiation in laser-produced tin droplet plasma are investigated experimentally and theoretically. Tin droplets with a diameter of 150 μm are irradiated by a pulsed Nd:YAG laser. The ion time-of-flight spectra measured from the plasma formed by laser irradiation of the tin droplets are interpreted in terms of a theoretical elliptical Druyvesteyn distribution to deduce ion density distributions including kinetic temperatures of the plasma. The opacity of the plasma for extreme ultraviolet radiation is calculated based on the deduced ion densities and temperatures, and the angular distribution of extreme ultraviolet radiation is expressed as a function of the opacity using the Beer-Lambert law. Our results show that the calculated angular distribution of extreme ultraviolet radiation is in satisfactory agreement with the experimental data.

  17. Angular distribution of ions and extreme ultraviolet emission in laser-produced tin droplet plasma

    SciTech Connect

    Chen, Hong; Duan, Lian; Lan, Hui; Wang, Xinbing Chen, Ziqi; Zuo, Duluo; Lu, Peixiang

    2015-05-21

    Angular-resolved ion time-of-flight spectra as well as extreme ultraviolet radiation in laser-produced tin droplet plasma are investigated experimentally and theoretically. Tin droplets with a diameter of 150 μm are irradiated by a pulsed Nd:YAG laser. The ion time-of-flight spectra measured from the plasma formed by laser irradiation of the tin droplets are interpreted in terms of a theoretical elliptical Druyvesteyn distribution to deduce ion density distributions including kinetic temperatures of the plasma. The opacity of the plasma for extreme ultraviolet radiation is calculated based on the deduced ion densities and temperatures, and the angular distribution of extreme ultraviolet radiation is expressed as a function of the opacity using the Beer–Lambert law. Our results show that the calculated angular distribution of extreme ultraviolet radiation is in satisfactory agreement with the experimental data.

  18. Electron roles in extreme ultraviolet lithography mirror contamination and flashover

    NASA Astrophysics Data System (ADS)

    Catalfano, Mark

    The purpose of this study was to characterize and study the contamination behavior of residual hydrocarbons and water vapor in a vacuum environment similar to that suited to the performance of EUV Lithography devices. A 50nm ruthenium film deposited on a silicon surface which served to simulate the Ru coated mirrors in a typical lithography setup was bombarded with 13.5 nm wavelength light at a grazing angle. We then studied in real-time the contamination effect by using extreme ultraviolet photoelectron spectroscopy (EUPS). This allowed us to examine the behavior of the contaminants as they formed dipoles. By monitoring X-Ray Photoelectron Spectroscopy (XPS) as a function of angle, we determined that carbon species may be more prevalent in the normal directions, while water and related species tend to be at grazing angles. While characterizing the contamination is certainly important for finding ways of mitigating it, we also attempted to prove that the electrons from a typical EUV source are just as important in terms of causing contamination if not more so than the light itself. By monitoring the contamination with both AES and XPS together, we were able to prove that in the absence of electrons the carbon buildup was far reduced. Similar results were found while studying the grazing angle reflectivity of the ruthenium sample. Electrons also proved to be important in surface flashover, a phenomenon in which the polarity on the surface can suddenly switch from negative to positive over a course of seconds. We saw this effect on gold and examined it in real-time with the help of secondary electron spectroscopy (SES). The flashover effect seemed to be defect driven. Interestingly, there was a dependence on energy change: when changing electrons from a lower to higher energy a flashover was observed, but not while changing from a high to a low energy. While we observed this on gold, silicon, and carbon it could certainly be extended to occurring on the photoresist

  19. Ultrafast Extreme Ultraviolet Spectroscopy of Lead Iodide and Methylammonium Lead Iodide

    NASA Astrophysics Data System (ADS)

    Verkamp, Max; Lin, Ming-Fu; Ryland, Elizabeth; Vura-Weis, Josh

    Methylammonium lead iodide (perovskite) is a leading candidate for use in next-generation solar cell devices. However, the photophysics of perovskite responsible for its strong photovoltaic qualities are not fully understood. Ultrafast extreme ultraviolet (XUV) spectroscopy was used to investigate relaxation dynamics in perovskite and its precursor, lead iodide, with carrier-specific signals arising from transitions from a common inner-shell level (I 4d) to the valence and conduction bands. Ultrashort (30 fs) pulses of XUV radiation in a broad spectrum (40-70 eV) were obtained using high-harmonic generation in a tabletop instrument. Transient absorption measurements with visible pump (3.1 eV) and XUV probe directly observed the relaxation of charge carriers after above band excitation for both perovskite and lead iodide in the femtosecond and picosecond time ranges.

  20. Evaluation of alcoholic hydroxyl derivatives for chemically amplified extreme ultraviolet resist

    NASA Astrophysics Data System (ADS)

    Furukawa, Kikuo; Kozawa, Takahiro; Tagawa, Seiichi

    2009-03-01

    Extreme ultraviolet (EUV) lithography is the most favorable process as next-generation lithography. For the development of EUV resists, phenolic materials such as poly (4-hydroxystyrene) have been investigated. Phenolic hydroxyl groups of polymers play an important role in acid diffusion, dissolution kinetics, and adhesion to substrates. Besides these important roles, phenolic hydroxyl groups are also an effective proton source in acid generation in EUV resists. However, the roles of alcohol hydroxyl groups have not been well-studied. To clarify the difference between phenolic and alcoholic hydroxyl groups upon exposure to EUV radiation, we synthesized acrylic terpolymers containing alcoholic hydroxyl groups as model photopolymers and exposed the resist samples based on these polymers to EUV radiation. On the basis of the lithographic performances of these resist samples, we evaluated the characteristics of alcoholic hydroxyl groups upon exposure to EUV radiation. We discuss the relationship between the chemical structures of these derivatives and lithographic performance.

  1. Spectroscopy of the Far and Extreme Ultraviolet Dayglow.

    NASA Astrophysics Data System (ADS)

    Bowers, Charles W.

    We have designed, built and flown in a sounding rocket payload a spectrograph with (DBLTURN) 2 (ANGSTROM) resolution from 850 (ANGSTROM) to 1850 (ANGSTROM) obtaining the highest resolution, broad wavelength coverage UV dayglow spectrum to date. This instrument utilizes a newly developed photon counting detector consisting of an ultraviolet-to -visible-light image intensifier with two microchannel plates in a tandem arrangement followed by a phosphor coated on the face of a fiber optics output bundle. Light generated in the phosphor by electron pulses produced by the MCP stack is transmitted to a Reticon (1024S) photodiode array with 1024 independent photodiodes. The broad light pulses generated by the intensifier were detected by the photodiode array. This flight data was transmitted to the ground and centroided, recovering the spectrograph resolution of (DBLTURN) 2 (ANGSTROM). The vacuum spectrograph contains an osmium coated, holographic f/2 concave diffraction grating, baffled to f/4 for flight. A movable slit wheel mechanism provides a vacuum seal, which is broken during flight as the entrance slit is moved into position. The UV dayglow spectrum obtained is presented and tentative identification of most of the emission features is made. A relatively bright emission line at 1173 (ANGSTROM) is identified as arising from the OI 3s' ('3)D('0) - 2p('4) ('1)D transition and is well resolved from adjacent NI emission features. Enhanced emission from this line is expected by the radiative entrapment of photons from the strong, optically thick 989 (ANGSTROM) emission feature. The simultaneous observations of the 989 (ANGSTROM) and 1173 (ANGSTROM) emissions allows comparison with model predictions of the variation with altitude of these related features (Meier, 1982). This comparison is consistent with the radiative entrapment model showing a decrease in 989 (ANGSTROM) emission and an increase in 1173 (ANGSTROM) emission at lower altitudes. The data are also consistent

  2. Extreme Ultraviolet Variability Experiment (EVE) Multiple EUV Grating Spectrographs (MEGS): Radiometric Calibrations and Results

    NASA Technical Reports Server (NTRS)

    Hock, R. A.; Woods, T. N.; Crotser, D.; Eparvier, F. G.; Woodraska, D. L.; Chamberlin, P. C.; Woods, E. C.

    2010-01-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in early 2010, incorporates a suite of instruments including the Extreme Ultraviolet Variability Experiment (EVE). EVE has multiple instruments including the Multiple Extreme ultraviolet Grating Spectrographs (MEGS) A, B, and P instruments, the Solar Aspect Monitor (SAM), and the Extreme ultraviolet SpectroPhotometer (ESP). The radiometric calibration of EVE, necessary to convert the instrument counts to physical units, was performed at the National Institute of Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF III) located in Gaithersburg, Maryland. This paper presents the results and derived accuracy of this radiometric calibration for the MEGS A, B, P, and SAM instruments, while the calibration of the ESP instrument is addressed by Didkovsky et al. . In addition, solar measurements that were taken on 14 April 2008, during the NASA 36.240 sounding-rocket flight, are shown for the prototype EVE instruments.

  3. FAST TRACK COMMUNICATION: Inhomogeneous charge redistribution in Xe clusters exposed to an intense extreme ultraviolet free electron laser

    NASA Astrophysics Data System (ADS)

    Iwayama, H.; Sugishima, A.; Nagaya, K.; Yao, M.; Fukuzawa, H.; Motomura, K.; Liu, X.-J.; Yamada, A.; Wang, C.; Ueda, K.; Saito, N.; Nagasono, M.; Tono, K.; Yabashi, M.; Ishikawa, T.; Ohashi, H.; Kimura, H.; Togashi, T.

    2010-08-01

    The emission of highly charged ions from Xe clusters exposed to intense extreme ultraviolet laser pulses (λ ~ 52 nm) from the free electron laser in Japan was investigated using ion momentum spectroscopy. With increasing average cluster size, we observed multiply charged ions Xez + up to z = 3. From kinetic energy distributions, we found that multiply charged ions were generated near the cluster surface. Our results suggest that charges are inhomogeneously redistributed in the cluster to lower the total energy stored in the clusters.

  4. Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2014-03-01

    The resolution of extreme ultraviolet (EUV) lithography with chemically amplified resist processes has reached 16 nm (half-pitch). The development of chemically amplified resists is ongoing toward the 11 nm node. However, the stochastic effects are increasingly becoming a significant concern with the continuing shrinkage of features. In this study, the fluctuation of protected unit distribution caused by the stochastic effects during image formation was investigated assuming line-and-space patterns with 11 nm half-pitch. Contrary to expectations, the standard deviation of the number of protected units connected to a polymer after postexposure baking (PEB) did not differ from that for 16 nm half-pitch. The standard deviation after PEB increased with the effective reaction radius for deprotection and the initial standard deviation before PEB. Because of the severe requirements for resist processes, the stochastic effects in chemical reactions should be taken into account in the design of next-generation resists.

  5. Relativistic electron mirrors from nanoscale foils for coherent frequency upshift to the extreme ultraviolet

    PubMed Central

    Kiefer, D.; Yeung, M.; Dzelzainis, T.; Foster, P.S.; Rykovanov, S.G.; Lewis, C.LS.; Marjoribanks, R.S.; Ruhl, H.; Habs, D.; Schreiber, J.; Zepf, M.; Dromey, B.

    2013-01-01

    Reflecting light from a mirror moving close to the speed of light has been envisioned as a route towards producing bright X-ray pulses since Einstein’s seminal work on special relativity. For an ideal relativistic mirror, the peak power of the reflected radiation can substantially exceed that of the incident radiation due to the increase in photon energy and accompanying temporal compression. Here we demonstrate for the first time that dense relativistic electron mirrors can be created from the interaction of a high-intensity laser pulse with a freestanding, nanometre-scale thin foil. The mirror structures are shown to shift the frequency of a counter-propagating laser pulse coherently from the infrared to the extreme ultraviolet with an efficiency >104 times higher than in the case of incoherent scattering. Our results elucidate the reflection process of laser-generated electron mirrors and give clear guidance for future developments of a relativistic mirror structure. PMID:23612304

  6. Optimization of fullerene-based negative tone chemically amplified fullerene resist for extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Frommhold, A.; Yang, D. X.; McClelland, A.; Xue, X.; Ekinci, Y.; Palmer, R. E.; Robinson, A. P. G.

    2014-03-01

    While the technological progress of Next Generation Lithography (NGL) steadily continues, further progress is required before successful insertion in high volume manufacturing is possible. A key issue is the development of new resists suitable to achieve higher lithographic resolution with acceptable sensitivity and line edge roughness. Molecular resists have been a primary focus of interest for NGL because they promise high resolution and small line edge roughness (LER), but no suitable resist candidate has emerged yet that fulfills all of the industry's criteria. We have previously shown first extreme ultraviolet lithography (EUVL) exposures for a new fullerene derivative based three-component negative tone chemically amplified resist with suitable properties close to or within the target range of the resist metrics as set out in the International Technology Roadmap for Semiconductors for 2016. Here we present the results of our efforts to optimize the EUVL performance of our resist system especially with regards to LER.

  7. Ionization Avalanching in Clusters Ignited by Extreme-Ultraviolet Driven Seed Electrons.

    PubMed

    Schütte, Bernd; Arbeiter, Mathias; Mermillod-Blondin, Alexandre; Vrakking, Marc J J; Rouzée, Arnaud; Fennel, Thomas

    2016-01-22

    We study the ionization dynamics of Ar clusters exposed to ultrashort near-infrared (NIR) laser pulses for intensities well below the threshold at which tunnel ionization ignites nanoplasma formation. We find that the emission of highly charged ions up to Ar^{8+} can be switched on with unit contrast by generating only a few seed electrons with an ultrashort extreme-ultraviolet (XUV) pulse prior to the NIR field. Molecular dynamics simulations can explain the experimental observations and predict a generic scenario where efficient heating via inverse bremsstrahlung and NIR avalanching is followed by resonant collective nanoplasma heating. The temporally and spatially well-controlled injection of the XUV seed electrons opens new routes for controlling avalanching and heating phenomena in nanostructures and solids, with implications for both fundamental and applied laser-matter science. PMID:26849590

  8. Relativistic electron mirrors from nanoscale foils for coherent frequency upshift to the extreme ultraviolet.

    PubMed

    Kiefer, D; Yeung, M; Dzelzainis, T; Foster, P S; Rykovanov, S G; Lewis, C Ls; Marjoribanks, R S; Ruhl, H; Habs, D; Schreiber, J; Zepf, M; Dromey, B

    2013-01-01

    Reflecting light from a mirror moving close to the speed of light has been envisioned as a route towards producing bright X-ray pulses since Einstein's seminal work on special relativity. For an ideal relativistic mirror, the peak power of the reflected radiation can substantially exceed that of the incident radiation due to the increase in photon energy and accompanying temporal compression. Here we demonstrate for the first time that dense relativistic electron mirrors can be created from the interaction of a high-intensity laser pulse with a freestanding, nanometre-scale thin foil. The mirror structures are shown to shift the frequency of a counter-propagating laser pulse coherently from the infrared to the extreme ultraviolet with an efficiency >10(4) times higher than in the case of incoherent scattering. Our results elucidate the reflection process of laser-generated electron mirrors and give clear guidance for future developments of a relativistic mirror structure. PMID:23612304

  9. Modeling and measuring the transport and scattering of energetic debris in an extreme ultraviolet plasma source

    NASA Astrophysics Data System (ADS)

    Sporre, John R.; Elg, Daniel T.; Kalathiparambil, Kishor K.; Ruzic, David N.

    2016-01-01

    A theoretical model for describing the propagation and scattering of energetic species in an extreme ultraviolet (EUV) light lithography source is presented. An EUV light emitting XTREME XTS 13-35 Z-pinch plasma source is modeled with a focus on the effect of chamber pressure and buffer gas mass on energetic ion and neutral debris transport. The interactions of the energetic debris species, which is generated by the EUV light emitting plasma, with the buffer gas and chamber walls are considered as scattering events in the model, and the trajectories of the individual atomic species involved are traced using a Monte Carlo algorithm. This study aims to establish the means by which debris is transported to the intermediate focus with the intent to verify the various mitigation techniques currently employed to increase EUV lithography efficiency. The modeling is compared with an experimental investigation.

  10. Free-electron laser sources of extreme-ultraviolet radiation and their vacuum requirements

    SciTech Connect

    Newnam, B.E.

    1990-01-01

    Recent development of free-electron laser (FEL) component technologies should enable these devices to operate in the extreme-ultraviolet, well below 100 nm. When fully developed, FELs represent the next generation of coherent-radiation sources with peak- and average-power outputs surpassing those of any existing, continuously tunable photon source by many orders of magnitude. An rf-linac-based, multiple-FEL facility, spanning the spectral range from 1 nm to 100 {mu}m, is proposed. To enable such a facility to operate without significant degradation over long periods, contamination of certain of the FEL components must be prevented. Requirements for ultra-high vacuum and restricted contamination from outgassing from chamber walls are discussed. 73 refs., 11 figs., 4 tabs.

  11. Shot noise limit of sensitivity of chemically amplified resists used for extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Fujii, Shinya; Kozawa, Takahiro; Okamoto, Kazumasa; Santillan, Julius Joseph; Itani, Toshiro

    2015-11-01

    With the improvement of resolution, the shot noise effect becomes a serious concern in the lithography used for high-volume production of semiconductor devices. In this study, the shot noise limit of the sensitivity of chemically amplified resists was investigated from the viewpoint of sensitivity enhancement, assuming extreme ultraviolet lithography. The latent images of line-and-space patterns with 11 nm half-pitch were calculated using a Monte Carlo method. The effect of secondary electron blur was eliminated to clarify the shot noise limit of line edge roughness (LER). When the requirement for line width roughness (LWR) was assumed to be 10% critical dimension (CD), the shot noise limit of sensitivity was >100 mJ cm-2. For the 20% CD LWR, the shot noise limits of sensitivity for the 10, 20, and 30 wt % acid generator concentrations were 20, 9, and 7 mJ cm-2, respectively.

  12. Methods and apparatus for use with extreme ultraviolet light having contamination protection

    DOEpatents

    Chilese, Francis C.; Torczynski, John R.; Garcia, Rudy; Klebanoff, Leonard E.; Delgado, Gildardo R.; Rader, Daniel J.; Geller, Anthony S.; Gallis, Michail A.

    2016-07-12

    An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

  13. Effect of ultraviolet radiation on microorganisms as a principal extremal factor of space environment.

    PubMed

    Fedorova, R I

    1964-01-01

    1. The problem of the transport of viable germs through interplanetary space has recently acquired special interest arising from the necessity of sterilization of space ships. 2. Of all cosmic extremal factors ultraviolet solar radiation is the most dangerous for microorganisms. The intensity of the most bactericidal region of ultraviolet radiation at a distance of one astronomical unit from the sun is 2 x 10(3) erg per cm2. 3. Sensitivity of microorganisms to ultraviolet rays varies in a large range. For the most resistant forms the lethal dose is approximately 440000 erg per cm2. 4. The penetrating capacity of ultraviolet radiation is very low, and therefore, even insignificant amounts of organic or mineral substances may protect the bacterial cell. 5. Dust particles of terrestrial origin carrying on themselves bacterial spores exert upon the latter a protective effect against ultraviolet radiation. PMID:11881651

  14. Fluorescence of molecular hydrogen excited by solar extreme-ultraviolet radiation

    NASA Technical Reports Server (NTRS)

    Feldman, P. D.; Fastie, W. G.

    1973-01-01

    During trans-earth coast, the Apollo 17 ultraviolet spectrometer was scheduled to make observations of the far ultraviolet background in selected regions of the sky. In the course of one of these observations, the spacecraft fuel cells were routinely purged of excess hydrogen and water vapor. The ultraviolet fluorescence spectrum of the purged molecular hydrogen excited by solar extreme ultraviolet radiation is interpreted by absorption of solar L-beta and L-gamma radiation in the nearly resonant (6, 0) and (11, 0) Lyman bands. The results are deemed significant for ultraviolet spectroscopic investigations of the atmospheres of the moon and planets since Lyman-band fluorescence provides an unambiguous means of identification of molecular hydrogen in upper atmospheres.

  15. Atmosphere and water loss from early Mars under extreme solar wind and extreme ultraviolet conditions.

    PubMed

    Terada, Naoki; Kulikov, Yuri N; Lammer, Helmut; Lichtenegger, Herbert I M; Tanaka, Takashi; Shinagawa, Hiroyuki; Zhang, Tielong

    2009-01-01

    The upper limits of the ion pickup and cold ion outflow loss rates from the early martian atmosphere shortly after the Sun arrived at the Zero-Age-Main-Sequence (ZAMS) were investigated. We applied a comprehensive 3-D multi-species magnetohydrodynamic (MHD) model to an early martian CO(2)-rich atmosphere, which was assumed to have been exposed to a solar XUV [X-ray and extreme ultraviolet (EUV)] flux that was 100 times higher than today and a solar wind that was about 300 times denser. We also assumed the late onset of a planetary magnetic dynamo, so that Mars had no strong intrinsic magnetic field at that early period. We found that, due to such extreme solar wind-atmosphere interaction, a strong magnetic field of about approximately 4000 nT was induced in the entire dayside ionosphere, which could efficiently protect the upper atmosphere from sputtering loss. A planetary obstacle ( approximately ionopause) was formed at an altitude of about 1000 km above the surface due to the drag force and the mass loading by newly created ions in the highly extended upper atmosphere. We obtained an O(+) loss rate by the ion pickup process, which takes place above the ionopause, of about 1.5 x 10(28) ions/s during the first < or =150 million years, which is about 10(4) times greater than today and corresponds to a water loss equivalent to a global martian ocean with a depth of approximately 8 m. Consequently, even if the magnetic protection due to the expected early martian magnetic dynamo is neglected, ion pickup and sputtering were most likely not the dominant loss processes for the planet's initial atmosphere and water inventory. However, it appears that the cold ion outflow into the martian tail, due to the transfer of momentum from the solar wind to the ionospheric plasma, could have removed a global ocean with a depth of 10-70 m during the first < or =150 million years after the Sun arrived at the ZAMS. PMID:19216683

  16. Laser triggered Z-pinch broadband extreme ultraviolet source for metrology

    SciTech Connect

    Tobin, I.; Lunney, J. G.; Juschkin, L.; Sidelnikov, Y.; O'Reilly, F.; Sokell, E.; Sheridan, P.

    2013-05-20

    We compare the extreme ultraviolet emission characteristics of tin and galinstan (atomic %: Ga: 78.35, In: 14.93, Sn: 6.72) between 10 nm and 18 nm in a laser-triggered discharge between liquid metal-coated electrodes. Over this wavelength range, the energy conversion efficiency for galinstan is approximately half that of tin, but the spectrum is less strongly peaked in the 13-15 nm region. The extreme ultraviolet source dimensions were 110 {+-} 25 {mu}m diameter and 500 {+-} 125 {mu}m length. The flatter spectrum, and -19 Degree-Sign C melting point, makes this galinstan discharge a relatively simple high radiance extreme ultraviolet light source for metrology and scientific applications.

  17. Extreme ultraviolet reflectivity studies of gold on glass and metal substrates

    NASA Technical Reports Server (NTRS)

    Jelinsky, Sharon R.; Malina, Roger F.; Jelinsky, Patrick

    1988-01-01

    The paper reports measurements of the extreme ultraviolet reflectivity of gold from 44 to 920 A at grazing incidence. Gold was deposited using vacuum evaporation and electroplating on substrates of glass and polished nickel, respectively. Measurements are also presented of the extreme ultraviolet reflectivity of electroless nickel in the same wavelength region, where one of the polished nickel substrates was used as a sample. Derived optical constants for evaporated and electroplated gold and electroless nickel are presented. Additional studies of the effects of various contaminants on the EUV reflectivity are also reported. The variations of the optical constants are discussed in terms of density variations, surface roughness and contamination effects. These results ae reported as part of studies for the Extreme Ultraviolet Explorer satellite program to determine acceptance criteria for the EUV optics, contamination budgets and calibration plans.

  18. Concept Study Report: Extreme-Ultraviolet Imaging Spectrometer Solar-B

    NASA Technical Reports Server (NTRS)

    Doschek, George, A.; Brown, Charles M.; Davila, Joseph M.; Dere, Kenneth P.; Korendyke, Clarence M.; Mariska, John T.; Seely, John F.

    1999-01-01

    We propose a next generation Extreme-ultraviolet Imaging Spectrometer (EIS) that for the first time combines high spectral, spatial, and temporal resolution in a single solar spectroscopic instrument. The instrument consists of a multilayer-coated off-axis telescope mirror and a multilayer-coated grating spectrometer. The telescope mirror forms solar images on the spectrometer entrance slit assembly. The spectrometer forms stigmatic spectra of the solar region located at the slit. This region is selected by the articulated telescope mirror. Monochromatic images are obtained either by rastering the solar region across a narrow entrance slit, or by using a very wide slit (called a slot) in place of the slit. Monochromatic images of the region centered on the slot are obtained in a single exposure. Half of each optic is coated to maximize reflectance at 195 Angstroms; the other half to maximize reflectance at 270 Angstroms. The two Extreme Ultraviolet (EUV) wavelength bands have been selected to maximize spectral and dynamical and plasma diagnostic capabilities. Spectral lines are observed that are formed over a temperature range from about 0.1 MK to about 20 MK. The main EIS instrument characteristics are: wavelength bands - 180 to 204 Angstroms; 250 to 290 Angstroms; spectral resolution - 0.0223 Angstroms/pixel (34.3km/s at 195 Angstroms and 23.6 km/s at 284 Angstroms); slit dimensions - 4 slits, two currently specified dimensions are 1" x 1024" and 50" x 1024" (the slot); largest spatial field of view in a single exposure - 50" x 1024"; highest time resolution for active region velocity studies - 4.4 s.

  19. Sun's image in the extreme ultraviolet radiation emitted from the corona

    NASA Technical Reports Server (NTRS)

    1973-01-01

    The Skylab space station's Extreme Ultraviolet monitor is a closed loop television system that permitted man for the first time to watch the Sun's image in the extreme ultraviolet radiation emitted from its million-degree outer atmosphere, the corona. This photograph shows a view of the TV scope made by Scientist-Astronaut Owen K. Garriott, Skylab 3 science pilot, on August 15, 1973. Dr. Garriott made this picture with a Land-Polaroid SX-70 camera - the first time that any Polaroid camera has been used in space.

  20. Wave-mixing with high-order harmonics in extreme ultraviolet region

    SciTech Connect

    Dao, Lap Van; Dinh, Khuong Ba; Le, Hoang Vu; Gaffney, Naylyn; Hannaford, Peter

    2015-01-12

    We report studies of the wave-mixing process in the extreme ultraviolet region with two near-infrared driving and controlling pulses with incommensurate frequencies (at 1400 nm and 800 nm). A non-collinear scheme for the two beams is used in order to spatially separate and to characterise the properties of the high-order wave-mixing field. We show that the extreme ultraviolet frequency mixing can be treated by perturbative, very high-order nonlinear optics; the modification of the wave-packet of the free electron needs to be considered in this process.

  1. CITIUS: An infrared-extreme ultraviolet light source for fundamental and applied ultrafast science

    SciTech Connect

    Grazioli, C.; Gauthier, D.; Ivanov, R.; De Ninno, G.; Callegari, C.; Spezzani, C.; Ciavardini, A.; Coreno, M.; Frassetto, F.; Miotti, P.; Poletto, L.; Golob, D.; Kivimäki, A.; Mahieu, B.; Bučar, B.; Merhar, M.; Polo, E.; Ressel, B.

    2014-02-15

    We present the main features of CITIUS, a new light source for ultrafast science, generating tunable, intense, femtosecond pulses in the spectral range from infrared to extreme ultraviolet (XUV). The XUV pulses (about 10{sup 5}-10{sup 8} photons/pulse in the range 14-80 eV) are produced by laser-induced high-order harmonic generation in gas. This radiation is monochromatized by a time-preserving monochromator, also allowing one to work with high-resolution bandwidth selection. The tunable IR-UV pulses (10{sup 12}-10{sup 15} photons/pulse in the range 0.4-5.6 eV) are generated by an optical parametric amplifier, which is driven by a fraction of the same laser pulse that generates high order harmonics. The IR-UV and XUV pulses follow different optical paths and are eventually recombined on the sample for pump-probe experiments. We also present the results of two pump-probe experiments: with the first one, we fully characterized the temporal duration of harmonic pulses in the time-preserving configuration; with the second one, we demonstrated the possibility of using CITIUS for selective investigation of the ultra-fast dynamics of different elements in a magnetic compound.

  2. Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas

    SciTech Connect

    Kubiak, G.D.; Tichenor, D.A.; Sweatt, W.C.; Chow, W.W.

    1995-06-01

    Laser Plasma Sources (LPSS) of extreme ultraviolet radiation are an attractive alternative to synchrotron radiation sources for extreme ultraviolet lithography (EUVL) due to their modularity, brightness, and modest size and cost. To fully exploit the extreme ultraviolet power emitted by such sources, it is necessary to capture the largest possible fraction of the source emission half-sphere while simultaneously optimizing the illumination stationarity and uniformity on the object mask. In this LDRD project, laser plasma source illumination systems for EUVL have been designed and then theoretically and experimentally characterized. Ellipsoidal condensers have been found to be simple yet extremely efficient condensers for small-field EUVL imaging systems. The effects of aberrations in such condensers on extreme ultraviolet (EUV) imaging have been studied with physical optics modeling. Lastly, the design of an efficient large-solid-angle condenser has been completed. It collects 50% of the available laser plasma source power at 14 nm and delivers it properly to the object mask in a wide-arc-field camera.

  3. Wavebreaking-associated transmitted emission of attosecond extreme-ultraviolet pulses from laser-driven overdense plasmas

    NASA Astrophysics Data System (ADS)

    Chen, Zi-Yu; Cherednychek, Mykyta; Pukhov, Alexander

    2016-06-01

    We present a new mechanism of attosecond extreme-ultraviolet (XUV) pulses generation from a relativistic laser-driven overdense plasma surfaces in the wavebreaking regime. Through particle-in-cell simulations and analysis, we demonstrate that the observed ultrashort XUV emission for the parameters we considered is predominantly due to a strong plasma-density oscillation subsequent to wavebreaking. The coupling of the strong density variation and the transverse fields in the front surface layer gives rise to the transmitted emission with frequencies mainly around the local plasma frequency. This mechanism provides new insights into the scenarios of XUV generation from solid surfaces and the dynamics of laser–plasma interactions.

  4. Synthesis and characterization of attosecond light vortices in the extreme ultraviolet.

    PubMed

    Géneaux, R; Camper, A; Auguste, T; Gobert, O; Caillat, J; Taïeb, R; Ruchon, T

    2016-01-01

    Infrared and visible light beams carrying orbital angular momentum (OAM) are currently thoroughly studied for their extremely broad applicative prospects, among which are quantum information, micromachining and diagnostic tools. Here we extend these prospects, presenting a comprehensive study for the synthesis and full characterization of optical vortices carrying OAM in the extreme ultraviolet (XUV) domain. We confirm the upconversion rules of a femtosecond infrared helically phased beam into its high-order harmonics, showing that each harmonic order carries the total number of OAM units absorbed in the process up to very high orders (57). This allows us to synthesize and characterize helically shaped XUV trains of attosecond pulses. To demonstrate a typical use of these new XUV light beams, we show our ability to generate and control, through photoionization, attosecond electron beams carrying OAM. These breakthroughs pave the route for the study of a series of fundamental phenomena and the development of new ultrafast diagnosis tools using either photonic or electronic vortices. PMID:27573787

  5. Laser-assisted vacuum arc extreme ultraviolet source: a comparison of picosecond and nanosecond laser triggering

    NASA Astrophysics Data System (ADS)

    Beyene, Girum A.; Tobin, Isaac; Juschkin, Larissa; Hayden, Patrick; O’Sullivan, Gerry; Sokell, Emma; Zakharov, Vassily S.; Zakharov, Sergey V.; O’Reilly, Fergal

    2016-06-01

    Extreme ultraviolet (EUV) light generation by hybrid laser-assisted vacuum arc discharge plasmas, utilizing Sn-coated rotating-disc-electrodes, was investigated. The discharge was initiated by localized ablation of the liquid tin coating of the cathode disc by a laser pulse. The laser pulse, at 1064 nm, was generated by Nd:YAG lasers with variable energy from 1 to 100 mJ per pulse. The impact of shortening the laser pulse from 7 ns to 170 ps on the EUV generation has been investigated in detail. The use of ps pulses resulted in an increase in emission of EUV radiation. With a fixed discharge energy of ~4 J, the EUV conversion efficiency tends to plateau at ~2.4  ±  0.25% for the ps laser pulses, while for the ns pulses, it saturates at ~1.7  ±  0.3%. Under similar discharge and laser energy conditions, operating the EUV source with the ps-triggering resulted also in narrower spectral profiles of the emission in comparison to ns-triggering. The results indicate an advantage in using ps-triggering in laser-assisted discharges to produce brighter plasmas required for applications such as metrology.

  6. Berkeley extreme-ultraviolet airglow rocket spectrometer: BEARS.

    PubMed

    Cotton, D M; Chakrabarti, S

    1992-09-20

    We describe the Berkeley extreme-UV airglow rocket spectrometer, which is a payload designed to test several thermospheric remote-sensing concepts by measuring the terrestrial O I far-UV and extreme-UV dayglow and the solar extreme-UV spectrum simultaneously. The instrument consisted of two near-normal Rowland mount spectrometers and a Lyman-alpha photometer. The dayglow spectrometer covered two spectral regions from 980 to 1040 A and from 1300 to 1360 A with 1.5-A resolution. The solar spectrometer had a bandpass of 250-1150 A with an ~ 10-A resolution. All three spectra were accumulated by using a icrochannel-plate-intensified, two-dimensional imaging detector with three separate wedge-and strip anode readouts. The hydrogen Lyman-alpha photometer was included to monitor the solar Lyman-alpha irradiance and geocoronal Lyman-alpha emissions. The instrument was designed, fabricated, and calibrated at the University of California, Berkeley and was successfully launched on 30 September 1988 aboard the first test flight of a four-stage sounding rocket, Black Brant XII. PMID:20733778

  7. IUE spectra of Feige 4, a suspected source of extreme-ultraviolet radiation

    NASA Astrophysics Data System (ADS)

    Holm, A. V.; Boggess, A.

    1982-06-01

    IUE spectra are presented for Feige 4, a DB-type white dwarf. The observed energy distribution is in good agreement with that predicted by a model atmosphere with an effective temperature of 15,500 K and having extremely low hydrogen and metal abundances. These results are evidence against Feige 4 being the source of the apparent extreme-ultraviolet signal detected by Prognoz 6.

  8. IUE spectra of Feige 4, a suspected source of extreme-ultraviolet radiation

    NASA Technical Reports Server (NTRS)

    Holm, A. V.; Boggess, A.

    1982-01-01

    IUE spectra are presented for Feige 4, a DB-type white dwarf. The observed energy distribution is in good agreement with that predicted by a model atmosphere with an effective temperature of 15,500 K and having extremely low hydrogen and metal abundances. These results are evidence against Feige 4 being the source of the apparent extreme-ultraviolet signal detected by Prognoz 6.

  9. SOLAR-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2001-01-01

    This Monthly Progress Report covers the reporting period July 2001 of the Detailed Design and Development through Launch plus Thirty Days, Phase C/D, for selected components and subsystems of the Extreme Ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  10. SOLAR-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2001-01-01

    This Monthly Progress Report covers the reporting period through June 2001, Phase C/D, Detailed Design and Development Through Launch Plus Thirty Days, for selected components and subsystems of the Extreme ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  11. Solar-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2002-01-01

    This Monthly Progress Report covers the reporting period August 2002 of the Detailed Design and Development through Launch plus Thirty Days, Phase C/D, for selected components and subsystems of the Extreme ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  12. Optical constants in the extreme ultraviolet and soft X-ray region

    NASA Technical Reports Server (NTRS)

    Rife, J. C.; Osantowski, J. F.

    1982-01-01

    The nature of optical constants and their measurement by reflection or absorption techniques in the extreme ultraviolet and soft X-ray spectral region from 30 to 3000 eV is discussed with emphasis on mirror design. Sources of optical constant data are mentioned and reflectance measurements for SiC and Kanigen between 40 and 200 eV are reported.

  13. Low-cost method for producing extreme ultraviolet lithography optics

    DOEpatents

    Folta, James A.; Montcalm, Claude; Taylor, John S.; Spiller, Eberhard A.

    2003-11-21

    Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

  14. Extreme-ultraviolet lensless Fourier-transform holography.

    PubMed

    Lee, S H; Naulleau, P; Goldberg, K A; Cho, C H; Jeong, S; Bokor, J

    2001-06-01

    We demonstrate 100-nm-resolution holographic aerial image monitoring based on lensless Fourier-transform holography at extreme-UV (EUV) wavelengths, using synchrotron-based illumination. This method can be used to monitor the coherent imaging performance of EUV lithographic optical systems. The system has been implemented in the EUV phase-shifting point-diffraction interferometer recently developed at Lawrence Berkeley National Laboratory. Here we introduce the idea of the holographic aerial image-recording technique and present imaging performance characterization results for a 10x Schwarzschild objective, a prototype EUV lithographic optic. The results are compared with simulations, and good agreement is obtained. Various object patterns, including phase-shift-enhanced patterns, have been studied. Finally, the application of the holographic aerial image-recording technique to EUV multilayer mask-blank defect characterization is discussed. PMID:18357280

  15. Computation of reflected images from extreme ultraviolet masks

    NASA Astrophysics Data System (ADS)

    Bollepalli, Srinivas B.; Cerrina, Franco

    1999-06-01

    With EUV lithography emerging as a promising technology for semiconductor device fabrication with critical dimensions extreme ultra violet mask. In particular, we show the effects caused due to diffraction, non-uniformities in the multilayer stack due to substrate defects, and partial spatial coherence. Several simulation examples are presented.

  16. A study of extreme-ultraviolet emission from cataclysmic variables

    NASA Technical Reports Server (NTRS)

    Polidan, Ronald S.; Mauche, Christopher W.; Wade, Richard A.

    1990-01-01

    Voyager far- and extreme UV spectrophotometric observations of five cataclysmic variables (the dwarf novae SS Cyg and VW Hyi and the novalike variables V3885 Sgr, RW Sex, and IX Vel) are combined with neutral hydrogen column densities derived from the curve-of-growth analysis of interstellar absorption lines in high-resolution IUE spectra to place upper limits on the emitted flux in the 600-700 A EUV band. The Voyager observations of VW Hyi were obtained during both normal and superoutbursts. Detailed accretion disk model calculations show that most of the 600-700 A flux in these systems should originate in the inner accretion disk rather than in the boundary layer. For VW Hyi, the low neutral hydrogen column and excellent Voyager superoutburst data place the observed upper limit to the 600-700 A flux well below the expected EUV flux from the model calculations.

  17. An Optics Free Spectrometer for the Extreme Ultraviolet

    NASA Technical Reports Server (NTRS)

    Judge, D. L.; Daybell, M. D.; Hoffman, J. R.; Gruntman, M. A.; Ogawa, H. S.; Samson, J. A. R.

    1994-01-01

    The optics-free spectrometer is a photon spectrometer. It provides the photon spectrum of a broadband source by converting photons of energy E into electrons of energy E', according to the Einstein relation, E' = E - Ei. E, is the ionization threshold of the gas target of interest (any of the rare gases are suitable) and E is the incoming photon energy. As is evident from the above equation, only a single order spectrum is produced throughout the energy range between the first and second ionization potentials of the rare gas used. Photons with energy above the second ionization potential produce two groups of electrons, but they are readily distinguished from each other. This feature makes this device extremely useful for determining the true spectrum of a continuum source or a many line source. The principle of operation and the laboratory results obtained with a representative configuration of the optics-free spectrometer are presented.

  18. Extreme Ultraviolet Variability Experiment (EVE) Multiple EUV Grating Spectrographs (MEGS): Radiometric Calibrations and Results

    NASA Astrophysics Data System (ADS)

    Hock, R. A.; Chamberlin, P. C.; Woods, T. N.; Crotser, D.; Eparvier, F. G.; Woodraska, D. L.; Woods, E. C.

    2012-01-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in early 2010, incorporates a suite of instruments including the Extreme Ultraviolet Variability Experiment (EVE). EVE has multiple instruments including the Multiple Extreme ultraviolet Grating Spectrographs (MEGS) A, B, and P instruments, the Solar Aspect Monitor (SAM), and the Extreme ultraviolet SpectroPhotometer (ESP). The radiometric calibration of EVE, necessary to convert the instrument counts to physical units, was performed at the National Institute of Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF III) located in Gaithersburg, Maryland. This paper presents the results and derived accuracy of this radiometric calibration for the MEGS A, B, P, and SAM instruments, while the calibration of the ESP instrument is addressed by Didkovsky et al. ( Solar Phys., 2010, doi:10.1007/s11207-009-9485-8). In addition, solar measurements that were taken on 14 April 2008, during the NASA 36.240 sounding-rocket flight, are shown for the prototype EVE instruments.

  19. Fabrication of an extreme ultraviolet glancing incidence telescope

    NASA Technical Reports Server (NTRS)

    Fleetwood, C. M.; Mangus, J. D.

    1974-01-01

    A technique is described for use in the fabrication of glancing incidence telescopes which operate at large grazing angles (i.e., 8 to 15 degrees). Precision conic section plunge laps are used in a controlled grinding procedure to initially generate imaging surfaces which have a minimum of subsurface damage. A numerically controlled Moore Number 3 Measuring Machine is used throughout the fabrication procedure. Surface geometry accuracies on the order of one-tenth micron have been achieved.

  20. EUV SpectroPhotometer (ESP) in Extreme Ultraviolet Variability Experiment (EVE): Algorithms and Calibrations

    NASA Astrophysics Data System (ADS)

    Didkovsky, L.; Judge, D.; Wieman, S.; Woods, T.; Jones, A.

    2012-01-01

    The Extreme ultraviolet SpectroPhotometer (ESP) is one of five channels of the Extreme ultraviolet Variability Experiment (EVE) onboard the NASA Solar Dynamics Observatory (SDO). The ESP channel design is based on a highly stable diffraction transmission grating and is an advanced version of the Solar Extreme ultraviolet Monitor (SEM), which has been successfully observing solar irradiance onboard the Solar and Heliospheric Observatory (SOHO) since December 1995. ESP is designed to measure solar Extreme UltraViolet (EUV) irradiance in four first-order bands of the diffraction grating centered around 19 nm, 25 nm, 30 nm, and 36 nm, and in a soft X-ray band from 0.1 to 7.0 nm in the zeroth-order of the grating. Each band’s detector system converts the photo-current into a count rate (frequency). The count rates are integrated over 0.25-second increments and transmitted to the EVE Science and Operations Center for data processing. An algorithm for converting the measured count rates into solar irradiance and the ESP calibration parameters are described. The ESP pre-flight calibration was performed at the Synchrotron Ultraviolet Radiation Facility of the National Institute of Standards and Technology. Calibration parameters were used to calculate absolute solar irradiance from the sounding-rocket flight measurements on 14 April 2008. These irradiances for the ESP bands closely match the irradiance determined for two other EUV channels flown simultaneously: EVE’s Multiple EUV Grating Spectrograph (MEGS) and SOHO’s Charge, Element and Isotope Analysis System/ Solar EUV Monitor (CELIAS/SEM).

  1. Changes of solar extreme ultraviolet spectrum in solar cycle 24

    NASA Astrophysics Data System (ADS)

    Hao, Yongqiang; Zhang, Donghe; Xiao, Zuo; Huang, Jianping

    2016-07-01

    Following the extreme solar minimum during 2008 - 2009, solar activity keeps low in solar cycle 24 (SC24) and is making SC24 the weakest one of recent cycles. In this paper, we compare the solar EUV spectral irradiance between SC23 and SC24, using the measurements by the Solar EUV Experiment (SEE) on the Thermospheric Ionospheric Mesospheric Energy and Dynamics (TIMED) spacecraft. The EUV spectrum varies with solar activity, and is in general a linear function of a proxy index P= (F10.7 + F10.7A)/2. However, we find the slope of this function, i.e., the change rate of irradiance at each wavelength with P, differs between SC23 and SC24. Consequently, at a given P level, the irradiance in SC24 is higher at wavelength of 30 - 50 nm, but lower at 60 - 120 nm and longward of 140 nm; the inter-cycle variation of EUV irradiance at some wavelengths can be 30 - 40% in absolute flux. We further examine 38 most intense emission lines and find that, taking P as a reference, most of the bright coronal lines get stronger in SC24 and, by contrast, those from the chromosphere and transition region have less variability in SC24. We therefore suggest that, the empirical relation between solar EUV and P, which is derived from observations in previous solar cycles, may not adapt to SC24. The changes in EUV spectrum need to be considered in the models for aeronomic study, especially those using F10.7 index as an input parameter.

  2. Surface modification of organic polymer by dual action of extreme ultraviolet/visible-near infrared ultrashort pulses

    NASA Astrophysics Data System (ADS)

    Mocek, T.; Polan, J.; Homer, P.; Jakubczak, K.; Rus, B.; Kim, I. J.; Kim, C. M.; Lee, G. H.; Nam, C. H.; Hájková, V.; Chalupský, J.; Juha, L.

    2009-01-01

    We present the experimental evidence of structural surface modifications of poly(methyl methacrylate) (PMMA) caused by simultaneous action of extreme ultraviolet (XUV) (˜21 nm) and visible-near infrared (visible-NIR) (820/410 nm) ultrashort pulses. Although the fluence of each individual beam was far below the surface modification threshold, very efficient and specific material expansion was observed after irradiation of PMMA by more than ˜20 shots of mixed XUV/visible-NIR radiation. As the XUV photons generate free charge carriers, absorption of the optical radiation dramatically increases, which heats up the material and further enhances the XUV induced damage to the polymer chain.

  3. Surface modification of organic polymer by dual action of extreme ultraviolet/visible-near infrared ultrashort pulses

    SciTech Connect

    Mocek, T.; Polan, J.; Homer, P.; Jakubczak, K.; Rus, B.; Kim, I. J.; Kim, C. M.; Lee, G. H.; Nam, C. H.; Hajkova, V.; Chalupsky, J.; Juha, L.

    2009-01-15

    We present the experimental evidence of structural surface modifications of poly(methyl methacrylate) (PMMA) caused by simultaneous action of extreme ultraviolet (XUV) ({approx}21 nm) and visible-near infrared (visible-NIR) (820/410 nm) ultrashort pulses. Although the fluence of each individual beam was far below the surface modification threshold, very efficient and specific material expansion was observed after irradiation of PMMA by more than {approx}20 shots of mixed XUV/visible-NIR radiation. As the XUV photons generate free charge carriers, absorption of the optical radiation dramatically increases, which heats up the material and further enhances the XUV induced damage to the polymer chain.

  4. Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources

    DOEpatents

    Kubiak, Glenn D.; Bernardez, II, Luis J.

    2000-01-04

    A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.

  5. Optimization of electrostatic chuck for mask-blank flatness control in extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Shu, Emily Y.

    2007-05-01

    Overlay requirements of Extreme Ultra-violet Lithography (EUVL) dictate reticle flatness errors of 50nm or less. During the early phase of EUVL development, it was decided that an electrostatic chuck was required to flatten EUVL masks to these specifications. However current experience and test data have demonstrated that it will be very difficult to reach the desired mask flatness goal without a thorough understanding and advanced control of the echucking process. The results of a parametric model study are reported in this paper. In this study we calculated the chucking force dependence of activating voltage, e-chuck geometry, film material, and pin design, and then proposed an optimized chuck design. We have also engaged in a material study for the mask backside coating for the purpose of reducing flatness errors and minimizing backside particle generation. We have also designed and built an automated, vacuum based, interferometric metrology tool to enable e-chucking experimentation. An early status report of this tool will be included in this paper.

  6. Analytical treatment of the deformation behavior of extreme-ultraviolet-lithography masks during electrostatic chucking

    NASA Astrophysics Data System (ADS)

    Brandstetter, Gerd; Govindjee, Sanjay

    2012-10-01

    A new analytical approach is presented to predict mask deformation during electrostatic chucking in next-generation extreme-ultraviolet-lithography. Given an arbitrary profile measurement of the mask and chuck nonflatness, this method has been developed as an alternative to time-consuming finite element simulations for overlay error correction algorithms. We consider the feature transfer of each harmonic component in the profile shapes via linear elasticity theory and demonstrate analytically how high spatial frequencies are filtered. The method is compared to presumably more accurate finite element simulations and has been tested successfully in an overlay error compensation experiment, where the residual error y-component could be reduced by a factor of 2. As a side outcome, the formulation provides a tool to estimate the critical pin-size and -pitch such that the distortion on the mask front-side remains within given tolerances. We find for a numerical example that pin-pitches of less than 5 mm will result in a mask pattern distortion of less than 1 nm if the chucking pressure is below 30 kPa.

  7. Capturing the Magnetic and Structural Phase Transition of Ferh using Extreme Ultraviolet Light

    NASA Astrophysics Data System (ADS)

    Zusin, Dmitriy; Grychtol, Patrik; Gentry, Christian; Murnane, Margaret; Kapteyn, Henry; Canton, Sophie; Knut, Ronny; Shaw, Justin; Nembach, Hans; Silva, Thomas; Ceballos, Alejandro; Bordel, Catherine; Fischer, Peter; Hellman, Frances

    2015-03-01

    The temperature dependent transition from the anti-ferromagnetic to the ferromagnetic phase in FeRh is accompanied by a modification of its crystal lattice. The interplay between the magnetic and the structural transition is a matter of strong debate. It is important to better understand the mechanism(s) of the transition since it can be induced by femtosecond laser pulses and, unlike slower (nanosecond) magnetic phase transitions, does not seem to be limited by heat transfer. In this work, we use extreme ultraviolet light generated by a tabletop high harmonics source to perform element-selective investigations of the temperature-dependent magneto-optical response of a thin film FeRh sample. We study the optically induced phase transition using two ultrafast pump-probe spectroscopy approaches: by monitoring the time-resolved transversal magneto-optical Kerr effect (T-MOKE) and the transient change in reflectivity. PF acknowledges support from BES MSD DOE # DE-AC02-05-CH11231 and LFRIR program (# 2012K1A4A3053565) through NRF Korea funded by MEST, and JILA from DOE # DE-FG02-09ER4665.

  8. Plasma physics and radiation hydrodynamics in developing an extreme ultraviolet light source for lithography

    SciTech Connect

    Nishihara, Katsunobu; Nunami, Masanori; Fujioka, Shinsuke; Furukawa, Hiroyuki; Murakami, Masakatsu; Zhakhovskii, Vasilii; Gamata, Kouhei; Takata, Akira; Ueda, Hirofumi; Nishimura, Hiroaki; Izawa, Yasukazu; Miyanaga, Noriaki; Mima, Kunoki; Sunahara, Atsushi; Shimada, Yoshinori; Sasaki, Akira; Tanuma, Hajime; Fujima, Kazumi; Kato, Takako; More, Richard

    2008-05-15

    Extreme ultraviolet (EUV) radiation from laser-produced plasma (LPP) has been thoroughly studied for application in mass production of next-generation semiconductor devices. One critical issue for the realization of an LPP-EUV light source for lithography is the conversion efficiency (CE) from incident laser power to EUV radiation of 13.5-nm wavelength (within 2% bandwidth). Another issue is solving the problem of damage caused when debris reaches an EUV collecting mirror. Here, we present an improved power balance model, which can be used for the optimization of laser and target conditions to obtain high CE. An integrated numerical simulation code has been developed for the target design. The code agrees well with experimental results not only for CE but also for detailed EUV spectral structure. We propose a two-pulse irradiation scheme for high CE, and reduced ion debris using a carbon dioxide laser and a droplet or a punch-out target. Using our benchmarked numerical simulation code, we find a possibility to obtain CE up to 6-7%, which is more than twice that achieved to date. We discuss the reduction of ion energy within the two-pulse irradiation scheme. The mitigation of energetic ions by a magnetic field is also discussed, and we conclude that no serious instability occurs due to large ion gyroradius.

  9. Cancer cell classification with coherent diffraction imaging using an extreme ultraviolet radiation source

    PubMed Central

    Zürch, Michael; Foertsch, Stefan; Matzas, Mark; Pachmann, Katharina; Kuth, Rainer; Spielmann, Christian

    2014-01-01

    Abstract. In cancer treatment, it is highly desirable to classify single cancer cells in real time. The standard method is polymerase chain reaction requiring a substantial amount of resources and time. Here, we present an innovative approach for rapidly classifying different cell types: we measure the diffraction pattern of a single cell illuminated with coherent extreme ultraviolet (XUV) laser-generated radiation. These patterns allow distinguishing different breast cancer cell types in a subsequent step. Moreover, the morphology of the object can be retrieved from the diffraction pattern with submicron resolution. In a proof-of-principle experiment, we prepared single MCF7 and SKBR3 breast cancer cells on gold-coated silica slides. The output of a laser-driven XUV light source is focused onto a single unstained and unlabeled cancer cell. With the resulting diffraction pattern, we could clearly identify the different cell types. With an improved setup, it will not only be feasible to classify circulating tumor cells with a high throughput, but also to identify smaller objects such as bacteria or even viruses. PMID:26158049

  10. Characterization of gas targets for laser produced extreme ultraviolet plasmas with a Hartmann-Shack sensor

    SciTech Connect

    Peth, Christian; Kranzusch, Sebastian; Mann, Klaus; Vioel, Wolfgang

    2004-10-01

    A table top extreme ultraviolet (EUV)-source was developed at Laser-Laboratorium Goettingen for the characterization of optical components and sensoric devices in the wavelength region from 11 to 13 nm. EUV radiation is generated by focusing the beam of a Q-switched Nd:YAG laser into a pulsed xenon gas jet. Since a directed gas jet with a high number density is needed for an optimal performance of the source, conical nozzles with different cone angles were drilled with an excimer laser to produce a supersonic gas jet. The influence of the nozzle geometry on the gas jet was characterized with a Hartmann-Shack wave front sensor. The deformation of a planar wave front after passing the gas jet was analyzed with this sensor, allowing a reconstruction of the gas density distribution. Thus, the gas jet was optimized resulting in an increase of EUV emission by a factor of two and a decrease of the plasma size at the same time.

  11. Cancer cell classification with coherent diffraction imaging using an extreme ultraviolet radiation source.

    PubMed

    Zürch, Michael; Foertsch, Stefan; Matzas, Mark; Pachmann, Katharina; Kuth, Rainer; Spielmann, Christian

    2014-10-01

    In cancer treatment, it is highly desirable to classify single cancer cells in real time. The standard method is polymerase chain reaction requiring a substantial amount of resources and time. Here, we present an innovative approach for rapidly classifying different cell types: we measure the diffraction pattern of a single cell illuminated with coherent extreme ultraviolet (XUV) laser-generated radiation. These patterns allow distinguishing different breast cancer cell types in a subsequent step. Moreover, the morphology of the object can be retrieved from the diffraction pattern with submicron resolution. In a proof-of-principle experiment, we prepared single MCF7 and SKBR3 breast cancer cells on gold-coated silica slides. The output of a laser-driven XUV light source is focused onto a single unstained and unlabeled cancer cell. With the resulting diffraction pattern, we could clearly identify the different cell types. With an improved setup, it will not only be feasible to classify circulating tumor cells with a high throughput, but also to identify smaller objects such as bacteria or even viruses. PMID:26158049

  12. Chang'e-3 Extreme Ultraviolet Camera Observations of the Dynamics of the Earth's Plasmasphere

    NASA Astrophysics Data System (ADS)

    Fok, M. C. H.; Zhang, X.; He, F.; Chen, B.; Wang, H. N.; Shen, C.; Ping, J.; Nakano, S.

    2015-12-01

    The Moon-based Extreme Ultraviolet Camera (EUVC) aboard China's Chang'e-3 (CE-3) lunar lander has successfully imaged the global plasmasphere on the Moon for the first time through detecting the resonantly scattered sunlight by plasmaspheric He+ at 30.4 nm with a spatial resolution of 0.1 RE and a time resolution of 10 min. The characteristics and the analyzing methods of the EUVC images are introduced in detail in this report. The plasmapause locations on the magnetic equator are reconstructed with the Minimum L Algorithm and are quantitatively compared with those extracted from in-situ observations by DMSP, THEMIS, and RBSP satellites. Then the plasmapause evolutions during substorms on February 21 2014 and April 21 2014 are investigated. It is found that the evolutions of plasmapause correlate well in both universal time and magnetic local time with the equatorial boundaries of auroral oval during substorms. During these two cases, the solar-wind-driven convection and the geomagnetic activity are relatively weak and steady, and the plasmapause motions can reliably be attributed to the substorms. It is proposed that correlations between the auroral signatures and the plasmapause motions may be due to the generation and Earthward-propagation of dipolarization front and resultant pitch angle scattering. In future work, we will search more in-situ and remote sensing data in both the plasmasphere and the magnetotail regions to investigate the correlations between the plasmaspheric erosions, the dipolarization fronts, and the energetic ions injections.

  13. Optical proximity correction for extreme ultra-violet mask with pellicle

    NASA Astrophysics Data System (ADS)

    Mo, Soo-Yeon; Kim, In-Seon; Oh, Hye-Keun

    2015-10-01

    Extreme ultraviolet (EUV) lithography is considered as one of the viable solutions for production of the next generation integrated devices. EUV mask defect control becomes more critical issue in order to sustain the quality of wafer fabrication process. Since pellicle is the essential component to prevent patterning deformations caused by particle defects on EUV mask[1-2], EUV OPC (optical proximity correction) that takes into account for pellicle effects on imaging quality is required for achieving better pattern fidelity and critical dimension control. In this study, image blurring effect induced by the EUV mask pellicle on mask pattern structures was investigated and it was found that the localized short-range OPC using commercial software performed as desired considering transmission intensity loss due to pellicle. For experiment, edge placement error differences of the same 2D logic patterns with 16 nm half pitch with and without pellicle were compared. Finally, a method was suggested how patterning throughput loss caused by the transmission loss can be compensated by EUV OPC, which may allow pellicle transmission even below 90%.

  14. Influence of laser pulse duration on extreme ultraviolet and ion emission features from tin plasmas

    SciTech Connect

    Roy, A. E-mail: aroy@barc.gov.in; Harilal, S. S.; Polek, M. P.; Hassan, S. M.; Hassanein, A.; Endo, A.

    2014-03-15

    We investigated the role of laser pulse duration and intensity on extreme ultraviolet (EUV) generation and ion emission from a laser produced Sn plasma. For producing plasmas, planar slabs of pure Sn were irradiated with 1064 nm Nd:YAG laser pulses with varying pulse duration (5–20 ns) and intensity. Experimental results performed at CMUXE indicate that the conversion efficiency (CE) of the EUV radiation strongly depend on laser pulse width and intensity, with a maximum CE of ∼2.0% measured for the shortest laser pulse width used (5 ns). Faraday Cup ion analysis of Sn plasma showed that the ion flux kinetic profiles are shifted to higher energy side with the reduction in laser pulse duration and narrower ion kinetic profiles are obtained for the longest pulse width used. However, our initial results showed that at a constant laser energy, the ion flux is more or less constant regardless of the excitation laser pulse width. The enhanced EUV emission obtained at shortest laser pulse duration studied is related to efficient laser-plasma reheating supported by presence of higher energy ions at these pulse durations.

  15. Real-time and Sub-wavelength Ultrafast Coherent Diffraction Imaging in the Extreme Ultraviolet

    PubMed Central

    Zürch, M.; Rothhardt, J.; Hädrich, S.; Demmler, S.; Krebs, M.; Limpert, J.; Tünnermann, A.; Guggenmos, A.; Kleineberg, U.; Spielmann, C.

    2014-01-01

    Coherent Diffraction Imaging is a technique to study matter with nanometer-scale spatial resolution based on coherent illumination of the sample with hard X-ray, soft X-ray or extreme ultraviolet light delivered from synchrotrons or more recently X-ray Free-Electron Lasers. This robust technique simultaneously allows quantitative amplitude and phase contrast imaging. Laser-driven high harmonic generation XUV-sources allow table-top realizations. However, the low conversion efficiency of lab-based sources imposes either a large scale laser system or long exposure times, preventing many applications. Here we present a lensless imaging experiment combining a high numerical aperture (NA = 0.8) setup with a high average power fibre laser driven high harmonic source. The high flux and narrow-band harmonic line at 33.2 nm enables either sub-wavelength spatial resolution close to the Abbe limit (Δr = 0.8λ) for long exposure time, or sub-70 nm imaging in less than one second. The unprecedented high spatial resolution, compactness of the setup together with the real-time capability paves the way for a plethora of applications in fundamental and life sciences. PMID:25483626

  16. Charge Carrier Dynamics in Transition Metal Oxides Studied by Femtosecond Transient Extreme Ultraviolet Absorption Spectroscopy

    NASA Astrophysics Data System (ADS)

    Jiang, Chang-Ming

    With the ability to disentangle electronic transitions that occur on different elements and local electronic structures, time-resolved extreme ultraviolet (XUV) spectroscopy has emerged as a powerful tool for studying ultrafast dynamics in condensed phase systems. In this dissertation, a visible-pump/XUV-probe transient absorption apparatus with femtosecond resolution was constructed to investigate the carrier relaxation dynamics in semiconductors after photo-excitation. This includes timescales for carrier thermalization by carrier-carrier and carrier-phonon scattering. The 30 -- 72 eV photon energy coverage (17 -- 40 nm wavelength) generated by a table-top XUV light source is suitable for probing the 3p-to-3d core level absorptions of various transition metal oxides (TMOs) with specificities to elements and oxidation states. In Chapter 1, a brief introduction to charge carrier dynamics in semiconductor-based materials is given. In addition, fundamentals of core-level spectroscopy and the high harmonic generation (HHG) process are also addressed in this introductory chapter. Specifications of the experimental apparatus that was constructed are summarized in Chapter 2, including the design concepts and characterization of performance. Chapter 3 presents the spectral tunability of the XUV pulses generated from a semi-infinite gas cell (SIGC), as well as the data acquisition procedures. Charge carrier relaxation dynamics in Co3O4 following the charge transfer excitation pathway at 400 nm are documented in Chapter 4. In Chapter 5, various visible pump wavelengths are used to excite Co3O4 and the differences in the carrier dynamics versus excitation wavelength are considered. After selectively photoexciting a Si/TiO2 heterojunction, the resulted electron transfer process is observed and reported in Chapter 6. The concluding remarks of the dissertation are made in Chapter 7, while several ongoing time-resolved experiments are addressed in the Appendix sections.

  17. A PSF equalization technique for the Multi-Order Solar Extreme-ultraviolet Spectrograph (MOSES)

    NASA Astrophysics Data System (ADS)

    Atwood, Shane; Kankelborg, Charles

    2015-10-01

    The Multi-Order Solar Extreme Ultraviolet Spectrograph (MOSES) is a rocket-borne slitless imaging spectrometer, designed to observe He II (30.4 nm) emission in the solar transition region. This instrument forms three simultaneous images at spectral orders m=-1, 0, +1 over an extended field of view (FOV). A multi-layer coating on the grating and thin film filters in front of the detectors defines the instrument passband. Each image contains a unique combination of spectral and spatial information. Our overarching goal in analyzing these data is to estimate a spectral line profile at every point in the FOV. Each spectral order has different image geometry, and therefore different aberrations. Since the point spread function (PSF) differs between any two images, systematic errors are introduced when we use all three images together to invert for spectral line profiles. To combat this source of systematic error, we have developed a PSF equalization scheme. Determination of the image PSFs is impractical for several reasons, including changes that may occur due to vibration during both launch and recovery operations. We have therefore developed a strategy using only the solar images obtained during flight to generate digital filters that modify each image so that they have the same effective PSF. Generation of the PSF equalization filters does not require that the PSFs themselves be known. Our approach begins with the assumption that there are only two things that cause the power spectra of our images to differ: (1) aberrations; and (2) the FOV average spectral line profile, which is known in principle from an abundance of historical data. To validate our technique, we generate three synthetic images with three different PSFs. We compare PSF equalizations performed without knowledge of the PSF to corrections performed with that knowledge. Finally, we apply PSF equalization to solar images obtained in the 2006 MOSES flight and demonstrate the removal of artifacts.

  18. Supersonic cluster jet source for debris-free extreme ultraviolet production

    SciTech Connect

    Kubiak, G.D.; Bernardez, L.J.

    1997-09-01

    The supersonic cluster jet has been developed and characterized for use as a target medium to produce a clean source of extreme ultraviolet radiation for extreme ultraviolet lithography and other applications. Spectroscopic characterization of the laser plasma emission produced from Xe, O{sub 2} and Kr cluster gas targets has been performed. Xe is the most efficient target gas, exhibiting a conversion efficiency at 13.5 nm of 0.8% into the relevant 2.5% spectral bandwidth. The other target gases are less efficient in the spectral region of interest and, in the case of oxygen, emit {approximately}5 times less off-band radiation. The angular distribution of the Xe plasma emission has also been characterized.

  19. The Third Extreme Ultraviolet Explorer Right Angle Program Catalog: The Last Years

    NASA Astrophysics Data System (ADS)

    Christian, Damian J.

    2002-12-01

    We present 63 new extreme-ultraviolet sources from observations taken during the Right Angle Program (RAP) of the Extreme Ultraviolet Explorer (EUVE). This paper concentrates on data taken in the last years of the RAP, 1999 and 2000, with a sky coverage of 7%. We present sample light curves for several sources, including flare detections from the previously uncataloged source EUVE J0613-23.9B, the active late-type star EUVE J0728-20.9 (V372 Pup), and the cataclysmic variable EUVE J0332-25.9 (VY For). This final RAP catalog, combined with the EUVE all-sky survey, Lampton et al. faint list, and previous RAP catalogs, brings the total number of EUVE sources to nearly 1200.

  20. Actinic detection of sub-100 nm defects on extreme ultraviolet lithography mask blanks

    SciTech Connect

    Jeong, Seongtae; Johnson, Lewis; Rekawa, Seno; Walton, Chris C.; Prisbrey, Shon T.; Tejnil, Edita; Underwood, James H.; Bokor, Jeffrey; EECS Department, University of California, Berkeley, California 94720

    1999-11-01

    We present recent experimental results from a prototype actinic (operates at the 13 nm extreme ultraviolet wavelength) defect inspection system for extreme ultraviolet lithography mask blanks. The defect sensitivity of the current actinic inspection system is shown to reach 100 nm in experiments with programmed defects. A method to cross register and cross correlate between the actinic inspection system and a commercial visible-light scattering defect inspection system is also demonstrated. Thus, random, native defects identified using the visible-light tool can reliably be found and scanned by our actinic tool. We found that native defects as small as 86 nm (as classified by the visible-light tool) were detectable by the actinic tool. These results demonstrate the capability of this tool for independent defect counting experiments. (c) 1999 American Vacuum Society.

  1. X-ray and extreme ultraviolet imaging using layered synthetic microstructures

    NASA Technical Reports Server (NTRS)

    Underwood, J. H.; Barbee, T. W.; Shealy, D. L.

    1982-01-01

    Up to now designers of X-ray optical instruments such as microscopes and telescopes have been compelled to use mirrors operating at small glancing angles. However, using vapor deposition techniques, it is now possible to build multilayered thin film structures in which the individual layers have thicknesses comparable with a wavelength of X-rays. These devices operate in a manner exactly analogous to multilayer dielectric coatings at visible wavelengths and can be used to increase the X-ray and extreme ultraviolet reflectivity of surfaces at large glancing angles. These X-ray mirrors have numerous potential applications in X-ray optics. Attention is given to X-ray images with a normal incidence mirror, and applications of multilayer optics. Single-mirror telescopes for solar/stellar astronomy are discussed, taking into account solar corona and transition region studies, and X-ray and extreme ultraviolet astronomy. Hybrid X-ray telescopes are also considered.

  2. Calibration of a microchannel plate based extreme ultraviolet grazing incident spectrometer at the Advanced Light Source.

    PubMed

    Bakeman, M S; van Tilborg, J; Sokollik, T; Baum, D; Ybarrolaza, N; Duarte, R; Toth, C; Leemans, W P

    2010-10-01

    We present the design and calibration of a microchannel plate based extreme ultraviolet spectrometer. Calibration was performed at the Advance Light Source (ALS) at the Lawrence Berkeley National Laboratory (LBNL). This spectrometer will be used to record the single shot spectrum of radiation emitted by the tapered hybrid undulator (THUNDER) undulator installed at the LOASIS GeV-class laser-plasma-accelerator. The spectrometer uses an aberration-corrected concave grating with 1200 lines/mm covering 11-62 nm and a microchannel plate detector with a CsI coated photocathode for increased quantum efficiency in the extreme ultraviolet. A touch screen interface controls the grating angle, aperture size, and placement of the detector in vacuum, allowing for high-resolution measurements over the entire spectral range. PMID:21034012

  3. A NOISE ADAPTIVE FUZZY EQUALIZATION METHOD FOR PROCESSING SOLAR EXTREME ULTRAVIOLET IMAGES

    SciTech Connect

    Druckmueller, M.

    2013-08-15

    A new image enhancement tool ideally suited for the visualization of fine structures in extreme ultraviolet images of the corona is presented in this paper. The Noise Adaptive Fuzzy Equalization method is particularly suited for the exceptionally high dynamic range images from the Atmospheric Imaging Assembly instrument on the Solar Dynamics Observatory. This method produces artifact-free images and gives significantly better results than methods based on convolution or Fourier transform which are often used for that purpose.

  4. Apollo-Soyuz test project Extreme Ultraviolet Telescope MA-083. [stellar spectra

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1978-01-01

    Follow-on studies to the Apollo-Soyuz Extreme Ultraviolet Telescope experiment (MA-083) include analyses of individual target stars or classes of stars, not only with regard to the EUV data but also in connection with theoretical models and observations in other parts of the spectrum. Topics discussed include: observations of SS Cygni, Proxima Centauri, HZ 43, and Feige 24; computer searches for new EUV sources; Sirius: models and inferences; EUV emission from a hot gas; and the diffuse EUV background.

  5. Extreme ultraviolet marking system for anti-counterfeiting tags with adjustable security level

    NASA Astrophysics Data System (ADS)

    Di Lazzaro, P.; Bollanti, S.; Flora, F.; Mezi, L.; Murra, D.; Torre, A.; Bonfigli, F.; Montereali, R. M.; Vincenti, M. A.

    2012-01-01

    We present a recently patented apparatus which consists of an extreme ultraviolet radiation source writing invisible patterns on thin tags of alkali halides. The tags patterned using this method are almost impossible to counterfeit, and offer a much better protection against fakes than available anti-counterfeiting techniques. We will discuss if this novel technology is ready for industrial production of anti-counterfeiting tags.

  6. Bright subcycle extreme ultraviolet bursts from a single dense relativistic electron sheet.

    PubMed

    Ma, W J; Bin, J H; Wang, H Y; Yeung, M; Kreuzer, C; Streeter, M; Foster, P S; Cousens, S; Kiefer, D; Dromey, B; Yan, X Q; Meyer-ter-Vehn, J; Zepf, M; Schreiber, J

    2014-12-01

    Double-foil targets separated by a low density plasma and irradiated by a petawatt-class laser are shown to be a copious source of coherent broadband radiation. Simulations show that a dense sheet of relativistic electrons is formed during the interaction of the laser with the tenuous plasma between the two foils. The coherent motion of the electron sheet as it transits the second foil results in strong broadband emission in the extreme ultraviolet, consistent with our experimental observations. PMID:25526132

  7. High-resolution extreme-ultraviolet spectroscopy of potassium using anti-Stokes radiation

    NASA Technical Reports Server (NTRS)

    Rothenberg, J. E.; Young, J. F.; Harris, S. E.

    1981-01-01

    The use of a new extreme-ultraviolet radiation source based on spontaneous anti-Stokes scattering for high-resolution absorption spectroscopy of transition originating from the 3p6 shell of potassium is reported. The region from 546.6 to 536.8 A is scanned at a resolution of about 1.2 Kayser. Within this region, four previously unreported lines are observed.

  8. Design, fabrication, and characterization of high-efficiency extreme ultraviolet diffusers

    SciTech Connect

    Naulleau, Patrick P.; Liddle, J. Alexander; Salmassi, Farhad; Anderson, Erik H.; Gullikson, Eric M.

    2004-02-19

    As the development of extreme ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. The strong absorption of EUV by most materials and its extremely short wavelength, however, makes it very difficult to implement many components that are commonplace in the longer wavelength regimes. One such example is the diffuser often implemented with ordinary ground glass in the visible light regime. Here we demonstrate the fabrication of reflective EUV diffusers with high efficiency within a controllable bandwidth. Using these techniques we have fabricated diffusers with efficiencies exceeding 10% within a moderate angular single-sided bandwidth of approximately 0.06 radians.

  9. Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency.

    PubMed

    Bergmann, K; Rosier, O; Neff, W; Lebert, R

    2000-08-01

    An extreme-ultraviolet radiation source based on a xenon pinch plasma is discussed with respect to the demands on a radiation source for extreme-ultraviolet lithography. Operation of the discharge in a self-igniting-plasma mode and omitting a switch permits a very effective and low-inductive coupling of the electrically stored energy to the electrode system. The xenon plasma exhibits broadband emission characteristics that offer radiation near 11 and 13 nm. Both wavelengths are useful in combination with beryllium- and silicon-based multilayer mirrors. The plasma emits approximately 74 mW/sr at 11.5 nm and 40 mW/sr at 13.5 nm in a bandwidth of 2% when operated at a repetition frequency of 120 Hz. The source size is less than 500 microm in diameter (FWHM) when viewed from the axial direction. The pulse-to-pulse stability is better than 3.6%. First results with a repetition rate of as much as 6 kHz promise the possibility of scaling to the required emission power for extreme-ultraviolet lithography. PMID:18349959

  10. The extreme ultraviolet imager of solar orbiter: optical design and alignment scheme

    NASA Astrophysics Data System (ADS)

    Halain, J.-P.; Mazzoli, A.; Meining, S.; Rochus, P.; Renotte, E.; Auchère, F.; Schühle, U.; Delmotte, F.; Dumesnil, C.; Philippon, A.; Mercier, R.; Hermans, A.

    2015-09-01

    The Extreme Ultraviolet Imager (EUI) is one of the remote sensing instruments on-board the Solar Orbiter mission. It will provide dual-band full-Sun images of the solar corona in the extreme ultraviolet (17.1 nm and 30.4 nm), and high resolution images of the solar disk in both extreme ultraviolet (17.1 nm) and vacuum ultraviolet (Lyman-alpha 121.6 nm). The EUI optical design takes heritage of previous similar instruments. The Full Sun Imager (FSI) channel is a single mirror Herschel design telescope. The two High Resolution Imager (HRI) channels are based on a two-mirror optical refractive scheme, one Ritchey-Chretien and one Gregory optical design for the EUV and the Lyman-alpha channels, respectively. The spectral performances of the EUI channels are obtained thanks to dedicated mirror multilayer coatings and specific band-pass filters. The FSI channel uses a dual-band mirror coating combined with aluminum and zirconium band-pass filters. The HRI channels use optimized band-pass selection mirror coatings combined with aluminum band-pass filters and narrow band interference filters for Lyman-alpha. The optical performances result from accurate mirror manufacturing tolerances and from a two-step alignment procedure. The primary mirrors are first co-aligned. The HRI secondary mirrors and focal planes positions are then adjusted to have an optimum interferometric cavity in each of these two channels. For that purpose a dedicated alignment test setup has been prepared, composed of a dummy focal plane assembly representing the detector position. Before the alignment on the flight optical bench, the overall alignment method has been validated on the Structural and Thermal Model, on a dummy bench using flight spare optics, then on the Qualification Model to be used for the system verification test and qualifications.

  11. Absolute intensity calibration of the Wendelstein 7-X high efficiency extreme ultraviolet overview spectrometer system

    NASA Astrophysics Data System (ADS)

    Greiche, Albert; Biel, Wolfgang; Marchuk, Oleksandr; Burhenn, Rainer

    2008-09-01

    The new high effiency extreme ultraviolet overview spectrometer (HEXOS) system for the stellarator Wendelstein 7-X is now mounted for testing and adjustment at the tokamak experiment for technology oriented research (TEXTOR). One part of the testing phase was the intensity calibration of the two double spectrometers which in total cover a spectral range from 2.5 to 160.0 nm with overlap. This work presents the current intensity calibration curves for HEXOS and describes the method of calibration. The calibration was implemented with calibrated lines of a hollow cathode light source and the branching ratio technique. The hollow cathode light source provides calibrated lines from 16 up to 147 nm. We could extend the calibrated region in the spectrometers down to 2.8 nm by using the branching line pairs emitted by an uncalibrated pinch extreme ultraviolet light source as well as emission lines from boron and carbon in TEXTOR plasmas. In total HEXOS is calibrated from 2.8 up to 147 nm, which covers most of the observable wavelength region. The approximate density of carbon in the range of the minor radius from 18 to 35 cm in a TEXTOR plasma determined by simulating calibrated vacuum ultraviolet emission lines with a transport code was 5.5×1017 m-3 which corresponds to a local carbon concentration of 2%.

  12. The intrinsic extreme ultraviolet fluxes of F5 V to M5 V stars

    SciTech Connect

    Linsky, Jeffrey L.; Fontenla, Juan; France, Kevin E-mail: jfontenla@nwra.com

    2014-01-01

    Extreme ultraviolet (EUV) radiations (10-117 nm) from host stars play important roles in the ionization, heating, and mass loss from exoplanet atmospheres. Together with the host star's Lyα and far-UV (117-170 nm) radiation, EUV radiation photodissociates important molecules, thereby changing the chemistry in exoplanet atmospheres. Since stellar EUV fluxes cannot now be measured and interstellar neutral hydrogen completely obscures stellar radiation between 40 and 91.2 nm, even for the nearest stars, we must estimate the unobservable EUV flux by indirect methods. New non-LTE semiempirical models of the solar chromosphere and corona and solar irradiance measurements show that the ratio of EUV flux in a variety of wavelength bands to the Lyα flux varies slowly with the Lyα flux and thus with the magnetic heating rate. This suggests and we confirm that solar EUV/Lyα flux ratios based on the models and observations are similar to the available 10-40 nm flux ratios observed with the Extreme Ultraviolet Explorer (EUVE) satellite and the 91.2-117 nm flux observed with the Far Ultraviolet Spectroscopic Explorer (FUSE) satellite for F5 V-M5 V stars. We provide formulae for predicting EUV flux ratios based on the EUVE and FUSE stellar data and on the solar models, which are essential input for modeling the atmospheres of exoplanets.

  13. Development of ellipsoidal focusing mirror for soft x-ray and extreme ultraviolet light

    NASA Astrophysics Data System (ADS)

    Mimura, Hidekazu; Takei, Yoshinori; Saito, Takahiro; Kume, Takehiro; Motoyama, Hiroto; Egawa, Satoru; Takeo, Yoko; Higashi, Takahiro

    2015-08-01

    Mirrors are key devices for creating various systems in optics. Focusing X-ray and extreme ultraviolet (EUV) light requires mirror surfaces with an extremely high accuracy. The figure of an ellipsoidal mirror is obtained by rotating an elliptical profile, and using such a mirror, soft X-ray and EUV light can be focused to dimensions on the order of nanometers without chromatic aberration. Although the theoretical performance of ellipsoidal mirrors is extremely high, the fabrication of an ideal ellipsoidal mirror remains problematic. Based on this background, we have been working to develop a fabrication system for ellipsoidal mirrors. In this proceeding, we briefly introduce the fabrication process and the soft X-ray focusing performance of the ellipsoidal mirror fabricated using the proposed process.

  14. Observation of a Quasiperiodic Pulsation in Hard X-Ray, Radio, and Extreme-ultraviolet Wavelengths

    NASA Astrophysics Data System (ADS)

    Kumar, Pankaj; Nakariakov, Valery M.; Cho, Kyung-Suk

    2016-05-01

    We present a multiwavelength analysis of a quasiperiodic pulsation (QPP) observed in the hard X-ray (HXR), radio, and extreme-ultraviolet (EUV) channels during an M1.9 flare that occurred on 2011 September 23-24. The nonthermal HXR emission in 25-50 keV observed by RHESSI shows five distinct impulsive peaks of decaying amplitude with a period of about 3 minutes. A similar QPP was observed in the microwave emission recorded by the Nobeyama Radioheliograph and Polarimeter in the 2, 3.75, 9.4, and 17 GHz channels. Interestingly, the 3-minute QPP was also observed in the metric and decimetric radio frequencies (25-180, 245, 610 MHz) as repetitive type III bursts. Multiwavelength observations from the Solar Dynamics Observatory/Atmospheric Image Assembly, Hinode/SOT, and Solar TErrestrial RElations Observatory/SECCHI suggest a fan-spine topology at the eruption site, associated with the formation of a quasi-circular ribbon during the flare. A small filament was observed below the fan loops before the flare onset. The filament rose slowly and interacted with the ambient field. This behavior was followed by an untwisting motion of the filament. Two different structures of the filament showed an approximately 3-minute periodic alternate rotation in the clockwise and counterclockwise directions. The 3-minute QPP was found to highly correlate with 3-minute oscillations in a nearby sunspot. We suggest that the periodic reconnection (modulated either by a sunspot slow-mode wave or by an untwisting filament) at a magnetic null point most likely causes the repetitive particle acceleration, generating the QPP observed in HXR, microwave, and type III radio bursts.

  15. Extending the path for efficient extreme ultraviolet sources for advanced nanolithography

    SciTech Connect

    Sizyuk, Tatyana; Hassanein, Ahmed

    2015-09-15

    Developing efficient light sources for extreme ultraviolet (EUV) lithography is one of the most important problems of high volume manufacturing (HVM) of the next generation computer chips. Critical components of this technology are continued to face challenges in the demanding performance for HVM. Current investigations of EUV and beyond EUV (BEUV) community are focused on the dual-pulse laser produced plasma (LPP) using droplets of mass-limited targets. Two main objectives as well as challenges in the optimization of these light sources are related to enhancement of the conversion efficiency (CE) of the source and increase components lifetime of the collector optical system. These require significant experimental and computer simulation efforts. These requirements call for fine detail analysis of various plasma physics processes involved in laser target interactions and their effects on source optimization. We continued to enhance our comprehensive HEIGHTS simulation package and upgrade our CMUXE laboratories to study and optimize the efficiency of LPP sources. Integrated modeling and experimental research were done to both benchmark simulation results and to make projections and realistic predictions of the development path for powerful EUVL devices for HVM requirements. We continued the detail analysis of dual-pulse laser systems using various laser wavelengths and delay times between the two pulses. We showed that the efficiency of EUV sources can be improved utilizing the higher harmonics of Nd:YAG laser for the prepulse and the first harmonics for the main pulse, while still having lower efficiency than the combination involving CO{sub 2} laser in the range of parameters studied in this case. The differences in optimization process as well as in the source characteristics for two combinations of laser wavelengths were analyzed based on details of atomic and hydrodynamics processes during the evolving plasma plumes.

  16. Observation of a Quasiperiodic Pulsation in Hard X-Ray, Radio, and Extreme-ultraviolet Wavelengths

    NASA Astrophysics Data System (ADS)

    Kumar, Pankaj; Nakariakov, Valery M.; Cho, Kyung-Suk

    2016-05-01

    We present a multiwavelength analysis of a quasiperiodic pulsation (QPP) observed in the hard X-ray (HXR), radio, and extreme-ultraviolet (EUV) channels during an M1.9 flare that occurred on 2011 September 23–24. The nonthermal HXR emission in 25–50 keV observed by RHESSI shows five distinct impulsive peaks of decaying amplitude with a period of about 3 minutes. A similar QPP was observed in the microwave emission recorded by the Nobeyama Radioheliograph and Polarimeter in the 2, 3.75, 9.4, and 17 GHz channels. Interestingly, the 3-minute QPP was also observed in the metric and decimetric radio frequencies (25–180, 245, 610 MHz) as repetitive type III bursts. Multiwavelength observations from the Solar Dynamics Observatory/Atmospheric Image Assembly, Hinode/SOT, and Solar TErrestrial RElations Observatory/SECCHI suggest a fan-spine topology at the eruption site, associated with the formation of a quasi-circular ribbon during the flare. A small filament was observed below the fan loops before the flare onset. The filament rose slowly and interacted with the ambient field. This behavior was followed by an untwisting motion of the filament. Two different structures of the filament showed an approximately 3-minute periodic alternate rotation in the clockwise and counterclockwise directions. The 3-minute QPP was found to highly correlate with 3-minute oscillations in a nearby sunspot. We suggest that the periodic reconnection (modulated either by a sunspot slow-mode wave or by an untwisting filament) at a magnetic null point most likely causes the repetitive particle acceleration, generating the QPP observed in HXR, microwave, and type III radio bursts.

  17. Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching

    SciTech Connect

    Shin, H.; Srivastava, S. N.; Ruzic, D. N.

    2008-05-15

    Tin (Sn) has the advantage of delivering higher conversion efficiency compared to other fuel materials (e.g., Xe or Li) in an extreme ultraviolet (EUV) source, a necessary component for the leading next generation lithography. However, the use of a condensable fuel in a lithography system leads to some additional challenges for maintaining a satisfactory lifetime of the collector optics. A critical issue leading to decreased mirror lifetime is the buildup of debris on the surface of the primary mirror that comes from the use of Sn in either gas discharge produced plasma (GDPP) or laser produced plasma (LPP). This leads to a decreased reflectivity from the added material thickness and increased surface roughness that contributes to scattering. Inductively coupled plasma reactive ion etching with halide ions is one potential solution to this problem. This article presents results for etch rate and selectivity of Sn over SiO{sub 2} and Ru. The Sn etch rate in a chlorine plasma is found to be much higher (of the order of hundreds of nm/min) than the etch rate of other materials. A thermally evaporated Sn on Ru sample was prepared and cleaned using an inductively coupled plasma etching method. Cleaning was confirmed using several material characterization techniques. Furthermore, a collector mock-up shell was then constructed and etching was performed on Sn samples prepared in a Sn EUV source using an optimized etching recipe. The sample surface before and after cleaning was analyzed by atomic force microscopy, x-ray photoelectron spectroscopy, and Auger electron spectroscopy. The results show the dependence of etch rate on the location of Sn samples placed on the collector mock-up shell.

  18. On the nature of the extreme-ultraviolet late phase of solar flares

    SciTech Connect

    Li, Y.; Ding, M. D.; Guo, Y.; Dai, Y.

    2014-10-01

    The extreme-ultraviolet (EUV) late phase of solar flares is a second peak of warm coronal emissions (e.g., Fe XVI) for many minutes to a few hours after the GOES soft X-ray peak. It was first observed by the EUV Variability Experiment on board the Solar Dynamics Observatory (SDO). The late-phase emission originates from a second set of longer loops (late-phase loops) that are higher than the main flaring loops. It is suggested to be caused by either additional heating or long-lasting cooling. In this paper, we study the role of long-lasting cooling and additional heating in producing the EUV late phase using the enthalpy based thermal evolution of loops model. We find that a long cooling process in late-phase loops can well explain the presence of the EUV late-phase emission, but we cannot exclude the possibility of additional heating in the decay phase. Moreover, we provide two preliminary methods based on the UV and EUV emissions from the Atmospheric Imaging Assembly on board SDO to determine whether or not additional heating plays a role in the late-phase emission. Using nonlinear force-free field modeling, we study the magnetic configuration of the EUV late phase. It is found that the late phase can be generated either in hot spine field lines associated with a magnetic null point or in large-scale magnetic loops of multipolar magnetic fields. In this paper, we also discuss why the EUV late phase is usually observed in warm coronal emissions and why the majority of flares do not exhibit an EUV late phase.

  19. Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC

    NASA Astrophysics Data System (ADS)

    Racette, Kenneth C.; Williams, Carey T.; Fisch, Emily; Kindt, Louis; Lawliss, Mark; Ackel, Robin; Lercel, Michael J.

    2002-07-01

    Fabricating masks for extreme ultraviolet lithography is challenging. The high absorption of most materials at 13.4 nm and the small critical dimension (45 nm) at the target insertion node force many new features, including reflective mask design, new film choices, and stringent defect specifications. Fabrication of these masks requires the formation and patterning of both a repair buffer layer and an EUV absorber layer on top of a molybdenum/silicon multi-layer substrate. IBM and Photronics have been engaged in developing mask processing technology for x-ray, electron beam projection and extreme ultraviolet lithographies at the Next Generation Lithography Mask Center of Competency (NGL-MCoC) within IBM's mask facility at Essex Junction, Vermont. This paper describes recent results of mask fabrication on 6 x 6 x 1/4 inch EUVL substrates (quartz with molybdenum silicon multi-layers) at the MCoC. Masks fabricated with high and low-stress chromium and externally deposited chromium absorber films are compared. In particular, etch characteristics, image size, image placement, line edge roughness, and defect levels are presented and compared. Understanding the influence of the absorber film characteristics on these parameters will enable us to optimize the effectiveness of a given absorber film or to select acceptable alternatives.

  20. Multistep Ionization of Argon Clusters in Intense Femtosecond Extreme Ultraviolet Pulses

    SciTech Connect

    Bostedt, C.; Thomas, H.; Hoener, M.; Eremina, E.; Fennel, T.; Meiwes-Broer, K.-H.; Wabnitz, H.; Kuhlmann, M.; Ploenjes, E.; Tiedtke, K.; Treusch, R.; Feldhaus, J.; Castro, A. R. B. de; Moeller, T.

    2008-04-04

    The interaction of intense extreme ultraviolet femtosecond laser pulses ({lambda}=32.8 nm) from the FLASH free electron laser (FEL) with clusters has been investigated by means of photoelectron spectroscopy and modeled by Monte Carlo simulations. For laser intensities up to 5x10{sup 13} W/cm{sup 2}, we find that the cluster ionization process is a sequence of direct electron emission events in a developing Coulomb field. A nanoplasma is formed only at the highest investigated power densities where ionization is frustrated due to the deep cluster potential. In contrast with earlier studies in the IR and vacuum ultraviolet spectral regime, we find no evidence for electron emission from plasma heating processes.

  1. Earth-orbiting extreme ultraviolet spectroscopic mission: SPRINT-A/EXCEED

    NASA Astrophysics Data System (ADS)

    Yoshikawa, I.; Tsuchiya, F.; Yamazaki, A.; Yoshioka, K.; Uemizu, K.; Murakami, G.; Kimura, T.; Kagitani, M.; Terada, N.; Kasaba, Y.; Sakanoi, T.; Ishii, H.; Uji, K.

    2012-09-01

    The EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) mission is an Earth-orbiting extreme ultraviolet (EUV) spectroscopic mission and the first in the SPRINT series being developed by ISAS/JAXA. It will be launched in the summer of 2013. EUV spectroscopy is suitable for observing tenuous gases and plasmas around planets in the solar system (e.g., Mercury, Venus, Mars, Jupiter, and Saturn). Advantage of remote sensing observation is to take a direct picture of the plasma dynamics and distinguish between spatial and temporal variability explicitly. One of the primary observation targets is an inner magnetosphere of Jupiter, whose plasma dynamics is dominated by planetary rotation. Previous observations have shown a few percents of the hot electron population in the inner magnetosphere whose temperature is 100 times higher than the background thermal electrons. Though the hot electrons have a significant impact on the energy balance in the inner magnetosphere, their generation process has not yet been elucidated. In the EUV range, a number of emission lines originate from plasmas distributed in Jupiter's inner magnetosphere. The EXCEED spectrograph is designed to have a wavelength range of 55-145 nm with minimum spectral resolution of 0.4 nm, enabling the electron temperature and ion composition in the inner magnetosphere to be determined. Another primary objective is to investigate an unresolved problem concerning the escape of the atmosphere to space. Although there have been some in-situ observations by orbiters, our knowledge is still limited. The EXCEED mission plans to make imaging observations of plasmas around Venus and Mars to determine the amounts of escaping atmosphere. The instrument's field of view (FOV) is so wide that we can get an image from the interaction region between the solar wind and planetary plasmas down to the tail region at one time. This will provide us with information about outward-flowing plasmas, e.g., their composition

  2. Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection

    SciTech Connect

    Chai, Kil-Byoung; Bellan, Paul M.

    2013-12-15

    An ultra-fast extreme ultra-violet (EUV) movie camera has been developed for imaging magnetic reconnection in the Caltech spheromak/astrophysical jet experiment. The camera consists of a broadband Mo:Si multilayer mirror, a fast decaying YAG:Ce scintillator, a visible light block, and a high-speed visible light CCD camera. The camera can capture EUV images as fast as 3.3 × 10{sup 6} frames per second with 0.5 cm spatial resolution. The spectral range is from 20 eV to 60 eV. EUV images reveal strong, transient, highly localized bursts of EUV radiation when magnetic reconnection occurs.

  3. At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems.

    PubMed

    Naulleau, P; Goldberg, K A; Gullikson, E M; Bokor, J

    2000-06-10

    The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10x-reduction lithographic optical systems is presented. PMID:18345220

  4. Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography.

    PubMed

    Naulleau, Patrick P; Goldberg, Kenneth A; Batson, Phil; Bokor, Jeffrey; Denham, Paul; Rekawa, Senajith

    2003-02-10

    Scanning illumination systems provide for a powerful and flexible means for controlling illumination coherence properties. Here we present a scanning Fourier synthesis illuminator that enables microfield extreme ultraviolet lithography to be performed on an intrinsically coherent synchrotron undulator beamline. The effectiveness of the system is demonstrated through a variety of print experiments, including the use of resolution enhancing coherence functions that enable the printing of 50-nm line-space features by use of a lithographic optic with a numerical aperture of 0.1 and an operational wavelength of 13.4 nm. PMID:12593485

  5. Ablation and transmission of thin solid targets irradiated by intense extreme ultraviolet laser radiation

    NASA Astrophysics Data System (ADS)

    Aslanyan, V.; Kuznetsov, I.; Bravo, H.; Woolston, M. R.; Rossall, A. K.; Menoni, C. S.; Rocca, J. J.; Tallents, G. J.

    2016-09-01

    The interaction of an extreme ultraviolet (EUV) laser beam with a parylene foil was studied by experiments and simulation. A single EUV laser pulse of nanosecond duration focused to an intensity of 3 × 1010 W cm-2 perforated micrometer thick targets. The same laser pulse was simultaneously used to diagnose the interaction by a transmission measurement. A combination of 2-dimensional radiation-hydrodynamic and diffraction calculations was used to model the ablation, leading to good agreement with experiment. This theoretical approach allows predictive modelling of the interaction with matter of intense EUV beams over a broad range of parameters.

  6. Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

    NASA Astrophysics Data System (ADS)

    Noh, J. H.; Stanford, M. G.; Lewis, B. B.; Fowlkes, J. D.; Plank, H.; Rack, P. D.

    2014-12-01

    One critical area for the adoption of extreme ultraviolet (EUV) lithography is the development of appropriate mask repair strategies. To this end, we have explored focused electron beam-induced deposition of the ruthenium capping or protective layer. Electron beam-induced deposition (EBID) was used to deposit a ruthenium capping/protective film using the liquid bis(ethylcyclopentyldienyl)ruthenium(II) precursor. The carbon to ruthenium atomic ratio in the as-deposited material was estimated to be ~9/1. Subsequent to deposition, we demonstrate an electron stimulated purification process to remove carbon by-products from the deposit. Results indicate that high-fidelity nanoscale ruthenium repairs can be realized.

  7. Measured Pre-Flight Performance of the Extreme Ultraviolet Normal Incidence Spectrograph (EUNIS)

    NASA Astrophysics Data System (ADS)

    Thomas, R. J.; Rabin, D. M.; Nowak, M. D.; Gum, J. S.; Seely, J. F.; Seshadri, S.; Siegmund, O. H.

    2005-05-01

    The Extreme Ultraviolet Normal-Incidence Spectrograph (EUNIS) is a sounding rocket experiment that will investigate the energetics of the solar corona and hotter transition region through high-resolution imaging spectroscopy with a rapid (2 s) cadence. EUNIS features independent optical systems to record spatially co-aligned spectra over the two bandpasses 170--205 Å and 300--370 Å simultaneously. All the components in the detection chain have been characterized, including multilayer telescope mirrors, lithographic slits, multilayer diffraction gratings, microchannel plate intensifiers, and active pixel sensors. The results demonstrate that EUNIS is the most sensitive solar EUV spectrograph in existence. Its first flight is scheduled for 2005 August.

  8. Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool

    SciTech Connect

    Wronosky, J.B.; Smith, T.G.; Darnold, J.R.

    1995-12-01

    A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

  9. Exploring the temporally resolved electron density evolution in extreme ultra-violet induced plasmas

    NASA Astrophysics Data System (ADS)

    van der Horst, R. M.; Beckers, J.; Nijdam, S.; Kroesen, G. M. W.

    2014-07-01

    We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved in a low-pressure argon plasma by using a method called microwave cavity resonance spectroscopy. The measured electron density just after the EUV pulse is 2.6 × 1016 m-3. This is in good agreement with a theoretical prediction from photo-ionization, which yields a density of 4.5 × 1016 m-3. After the EUV pulse the density slightly increases due to electron impact ionization. The plasma (i.e. electron density) decays in tens of microseconds.

  10. Extreme ultraviolet source at 6.7 nm based on a low-density plasma

    SciTech Connect

    Higashiguchi, Takeshi; Yugami, Noboru; Otsuka, Takamitsu; Jiang, Weihua; Endo, Akira; Li Bowen; Kilbane, Deirdre; Dunne, Padraig; O'Sullivan, Gerry

    2011-11-07

    We demonstrate an efficient extreme ultraviolet (EUV) source for operation at {lambda} = 6.7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.

  11. Rare-earth plasma extreme ultraviolet sources at 6.5-6.7 nm

    SciTech Connect

    Otsuka, Takamitsu; Higashiguchi, Takeshi; Yugami, Noboru; Yatagai, Toyohiko; Kilbane, Deirdre; White, John; Dunne, Padraig; O'Sullivan, Gerry; Jiang, Weihua; Endo, Akira

    2010-09-13

    We have demonstrated a laser-produced plasma extreme ultraviolet source operating in the 6.5-6.7 nm region based on rare-earth targets of Gd and Tb coupled with a Mo/B{sub 4}C multilayer mirror. Multiply charged ions produce strong resonance emission lines, which combine to yield an intense unresolved transition array. The spectra of these resonant lines around 6.7 nm (in-band: 6.7 nm {+-}1%) suggest that the in-band emission increases with increased plasma volume by suppressing the plasma hydrodynamic expansion loss at an electron temperature of about 50 eV, resulting in maximized emission.

  12. Actual defect observation results of an extreme-ultraviolet blank mask by coherent diffraction imaging

    NASA Astrophysics Data System (ADS)

    Harada, Tetsuo; Hashimoto, Hiraku; Amano, Tsuyoshi; Kinoshita, Hiroo; Watanabe, Takeo

    2016-03-01

    Extreme-ultraviolet (EUV) lithography poses a number of challenges, one of which is the production of a defect-free mask. To observe the defects on an EUV mask in a quantitative phase image, we have developed a microcoherent EUV scatterometry microscope. The intensity and phase images of the defects are reconstructed using ptychography. We observe four actual defects on an EUV blank mask using the microscope. The reconstructed shapes of the actual defects correspond well to those measured by atomic force microscopy (AFM). Our microscope should therefore function as an essential review tool in characterizing defects.

  13. Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers

    NASA Astrophysics Data System (ADS)

    Li, W.; Urbanski, L.; Marconi, M. C.

    2015-12-01

    Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented.

  14. Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers.

    PubMed

    Li, W; Urbanski, L; Marconi, M C

    2015-12-01

    Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented. PMID:26723999

  15. Single shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution

    SciTech Connect

    Jones, Juanita; Brewer, Courtney A.; Brizuela, Fernando; Wachulak, Przemyslaw; Martz, Dale H.; Chao, Weilun; Anderson, Erik H.; Attwood, David T.; Vinogradov, Alexander V.; Artyukov, Igor A.; Ponomareko, Alexander G.; Kondratenko, Valeriy V.; Marconi, Mario C.; Rocca, Jorge J.; Menoni, Carmen S.

    2008-01-07

    We have demonstrated near-wavelength resolution microscopy in the extreme ultraviolet. Images of 50 nm diameter nanotubes were obtained with a single {approx}1 ns duration pulse from a desk-top size 46.9 nm laser. We measured the modulation transfer function of the microscope for three different numerical aperture zone plate objectives, demonstrating that 54 nm half-period structures can be resolved. The combination of near-wavelength spatial resolution and high temporal resolution opens myriad opportunities in imaging, such as the ability to directly investigate dynamics of nanoscale structures.

  16. Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography

    DOEpatents

    Montcalm, Claude; Stearns, Daniel G.; Vernon, Stephen P.

    1999-01-01

    A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.

  17. Grazing incidence metal optics for the Berkeley Extreme Ultraviolet Explorer satellite - A progress report

    NASA Technical Reports Server (NTRS)

    Finley, D.; Malina, R. F.; Bowyer, S.

    1985-01-01

    The four flight Wolter-Schwarzschild mirrors currently under fabrication for the Extreme Ultraviolet Explorer (EUVE) satellite are described. The principal figuring operation of these grazing incidence metal mirrors (gold over nickel on an aluminum substrate) is carried out by diamond turning at the Lawrence Livermore National Laboratories. Turning has been accomplished and optical testing results analyzed for three of the mirrors. As-turned values of 1.7 arc sec full width at half maximum (FWHM) and half energy width (HEW) of 5 arc seconds in the visible have been achieved. These results illustrate the great potential of precision fabrication technology for the production of large grazing incidence optics.

  18. Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

    SciTech Connect

    Higashiguchi, Takeshi Yamaguchi, Mami; Otsuka, Takamitsu; Nagata, Takeshi; Ohashi, Hayato; Li, Bowen; D’Arcy, Rebekah; Dunne, Padraig; O’Sullivan, Gerry

    2014-09-15

    Emission spectra from multiply charged potassium ions ranging from K{sup 3+} to K{sup 5+} have been obtained in the extreme ultraviolet (EUV) spectral region. A strong emission feature peaking around 38 nm, corresponding to a photon energy of 32.6 eV, is the dominant spectral feature at time-averaged electron temperatures in the range of 8−12 eV. The variation of this emission with laser intensity and the effects of pre-pulses on the relative conversion efficiency (CE) have been explored experimentally and indicate that an enhancement of about 30% in EUV CE is readily attainable.

  19. Design, fabrication and performance of two grazing incidence telescopes for celestial extreme ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Lampton, M.; Cash, W.; Malina, R. F.; Bowyer, S.

    1977-01-01

    The design and performance of grazing incidence telescopes for celestial extreme ultraviolet (EUV) astronomy are described. The telescopes basically consist of a star tracker, collimator, grazing incidence mirror, vacuum box lid, vacuum housing, filters, a ranicon detector, an electronics box, and an aspect camera. For the survey mirror a Wolter-Schwarzschild type II configuration was selected. Diamond-turning was used for mirror fabrication, a technique which machines surfaces to the order of 10 microns over the required dimensions. The design of the EUV spectrometer is discussed with particular reference to the optics for a primarily spectroscopic application and the fabrication of the f/10 optics.

  20. High-frequency surface acoustic wave propagation in nanaostructures characterized by coherent extreme ultraviolet beams

    SciTech Connect

    Siemens, M.; Li, Q.; Murnane, M.; Kapteyn, H.; Yang, R.; Anderson, E.; Nelson, K.

    2009-03-02

    We study ultrahigh frequency surface acoustic wave propagation in nickel-on-sapphire nanostructures. The use of ultrafast, coherent, extreme ultraviolet beams allows us to extend optical measurements of propagation dynamics of surface acoustic waves to frequencies of nearly 50 GHz, corresponding to wavelengths as short as 125 nm. We repeat the measurement on a sequence of nanostructured samples to observe surface acoustic wave dispersion in a nanostructure series for the first time. These measurements are critical for accurate characterization of thin films using this technique.

  1. Development of a Wafer Positioning System for the Sandia Extreme Ultraviolet Lithography Tool

    NASA Technical Reports Server (NTRS)

    Wronosky, John B.; Smith, Tony G.; Darnold, Joel R.

    1996-01-01

    A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

  2. Compact multi-bounce projection system for extreme ultraviolet projection lithography

    DOEpatents

    Hudyma, Russell M.

    2002-01-01

    An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.

  3. Oxidation resistance and microstructure of Ru-capped extreme ultraviolet lithography multilayers

    SciTech Connect

    Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J B; Nguyen, N; Baker, S L; Robinson, J C; Taylor, J S; Aquila, A; Edwards, N V

    2005-06-15

    The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, were investigated to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure was analyzed in detail with transmission electron microscopy (TEM). As compared to other Ru capping layers preparations studied here it is the only one that shows grains with preferential orientation. This information is essential for modeling and performance optimization of EUVL multilayers.

  4. Heating dynamics and extreme ultraviolet radiation emission of laser-produced Sn plasmas

    SciTech Connect

    Yuspeh, S.; Sequoia, K. L.; Tao, Y.; Tillack, M. S.; Burdt, R. A.; Najmabadi, F.

    2010-06-28

    The impact of 1.064 mum laser absorption depth on the heating and in-band (2% bandwidth) 13.5 nm extreme ultraviolet emissions in Sn plasmas is investigated experimentally and numerically. In-band emission lasting longer than the laser pulse and separation between the laser absorption and in-band emission region are observed. Maximum efficiency is achieved by additional heating of the core of the plasma to allow the optimal temperature to expand to a lower and more optically thin density. This leads to higher temperature plasma that emits less in-band light as compared to CO{sub 2} produced plasma sources for the same application.

  5. Picosecond pumping of extreme-ultraviolet lasers using preformed laser plasmas

    NASA Astrophysics Data System (ADS)

    Yamakoshi, H.; Herman, P. R.; Le Flohic, M. P.; Xiao, B.; Zhao, L.; Kulcsar, G.; Budnik, F. W.; Marjoribanks, R. S.

    1996-02-01

    Weak laser prepulses were used for the first time with picosecond-duration laser light to enhance laser-target absorption for efficient excitation of extreme-ultraviolet lasers. A traveling-wave excitation geometry and a self-healing mercury-wetted target were used with 300-ps prepulses to pump the photoionization Xe III laser at 109-nm wavelength. Fully saturated laser gain was demonstrated for both 32-ps and 1.4-ps small-signal gain coefficients exceeded 2 cm -1 for on-target laser fluences of only 4 J / cm2.

  6. Improving Ramsey spectroscopy in the extreme-ultraviolet region with a random-sampling approach

    SciTech Connect

    Eramo, R.; Bellini, M.; Corsi, C.; Liontos, I.; Cavalieri, S.

    2011-04-15

    Ramsey-like techniques, based on the coherent excitation of a sample by delayed and phase-correlated pulses, are promising tools for high-precision spectroscopic tests of QED in the extreme-ultraviolet (xuv) spectral region, but currently suffer experimental limitations related to long acquisition times and critical stability issues. Here we propose a random subsampling approach to Ramsey spectroscopy that, by allowing experimentalists to reach a given spectral resolution goal in a fraction of the usual acquisition time, leads to substantial improvements in high-resolution spectroscopy and may open the way to a widespread application of Ramsey-like techniques to precision measurements in the xuv spectral region.

  7. Silicon photodiode with selective Zr/Si coating for extreme ultraviolet spectral range

    SciTech Connect

    Aruev, P N; Barysheva, Mariya M; Ber, B Ya; Zabrodskaya, N V; Zabrodskii, V V; Lopatin, A Ya; Pestov, Alexey E; Petrenko, M V; Polkovnikov, V N; Salashchenko, Nikolai N; Sukhanov, V L; Chkhalo, Nikolai I

    2012-10-31

    The procedure of manufacturing silicon photodiodes with an integrated Zr/Si filter for extreme ultraviolet (EUV) spectral range is developed. A setup for measuring the sensitivity profile of detectors with spatial resolution better than 100 {mu}m is fabricated. The optical properties of silicon photodiodes in the EUV and visible spectral ranges are investigated. Some characteristics of SPD-100UV diodes with Zr/Si coating and without it, as well as of AXUV-100 diodes, are compared. In all types of detectors a narrow region beyond the operating aperture is found to be sensitive to the visible light. (photodetectors)

  8. Employing partially coherent, compact gas-discharge sources for coherent diffractive imaging with extreme ultraviolet light

    NASA Astrophysics Data System (ADS)

    Bußmann, J.; Odstrčil, M.; Bresenitz, R.; Rudolf, D.; Miao, Jianwei; Brocklesby, W. S.; Grützmacher, D.; Juschkin, L.

    2015-09-01

    Coherent diffractive imaging (CDI) and related techniques enable a new type of diffraction-limited high-resolution extreme ultraviolet (EUV) microscopy. Here, we demonstrate CDI reconstruction of a complex valued object under illumination by a compact gas-discharge EUV light source emitting at 17.3 nm (O VI spectral line). The image reconstruction method accounts for the partial spatial coherence of the radiation and allows imaging even with residual background light. These results are a first step towards laboratory-scale CDI with a gas-discharge light source for applications including mask inspection for EUV lithography, metrology and astronomy.

  9. Evolution of laser-produced Sn extreme ultraviolet source diameter for high-brightness source

    SciTech Connect

    Roy, Amitava E-mail: aroy@barc.gov.in; Arai, Goki; Hara, Hiroyuki; Higashiguchi, Takeshi; Ohashi, Hayato; Sunahara, Atsushi; Li, Bowen; Dunne, Padraig; O'Sullivan, Gerry; Miura, Taisuke; Mocek, Tomas; Endo, Akira

    2014-08-18

    We have investigated the effect of irradiation of solid Sn targets with laser pulses of sub-ns duration and sub-mJ energy on the diameter of the extreme ultraviolet (EUV) emitting region and source conversion efficiency. It was found that an in-band EUV source diameter as low as 18 μm was produced due to the short scale length of a plasma produced by a sub-ns laser. Most of the EUV emission occurs in a narrow region with a plasma density close to the critical density value. Such EUV sources are suitable for high brightness and high repetition rate metrology applications.

  10. Extreme ultraviolet photoresists: Film quantum yields and LER of thin film resists

    NASA Astrophysics Data System (ADS)

    Higgins, Craig

    Extreme ultraviolet (EUV) is the leading candidate for a commercially viable solution for next generation lithography. The development of EUV chemically amplified photoresists and processes are critical to the future lithographic requirements of the microelectronics industry. To meet the necessary requirements for both integrated circuit (IC) specifications and cost, the resolution, line-edge roughness (LER) and sensitivity all need to be reduced. Unfortunately, a fundamental trade-off has been observed between these three crucial elements. We have predicted that the best way to obtain the required resolution, line-edge roughness and sensitivity (RLS) is to create more acid molecules per photon absorbed. This quantity is referred to as the film quantum yield (FQY). Utilizing increased photoacid generator (PAG) concentrations, the impact of FQY on the overall resist lithographic performance is characterized. However, despite significant improvements in RLS performance, LER continues to fall significantly short of industry requirements. Lithographic exposures have shown that LER increases significantly as film thickness decreases (< 50 nm) for 193 nm and EUV wavelengths. LER degradation is a significant problem for future technology nodes where film thicknesses of 50 nm or less will be necessary to help mitigate pattern collapse. Understanding the mechanistic cause of the thickness dependent LER degradation is therefore very critical for future needs of the lithographic community. Investigations highlight key concerns related to the image degradation of ultra-thin film photoresists (< 50 nm) with the aim of better understanding the correlation between resist LER, acid diffusion and glass transition temperature. Meeting the required LER will become increasingly difficult for future technology nodes due to thin film effects. Therefore, alternative processes and LER mitigation techniques are likely required for the implementation of EUV. Studies have demonstrated that

  11. New measurements by the TIMED solar extreme-ultraviolet experiment: Implications for thermospheric modeling

    NASA Astrophysics Data System (ADS)

    Solomon, S. C.; Bailey, S. M.; Eparvier, F. G.; Gladstone, G. R.; Paxton, L. J.; Woods, T. N.

    2003-04-01

    The Thermosphere-Ionosphere-Mesosphere Energetics and Dynamics (TIMED) satellite, launched in December 2001, is now performing comprehensive new measurements of the solar irradiance spectrum in the extreme-ultraviolet and soft X-ray regions. The TIMED solar EUV experiment (SEE) consists of an ultraviolet spectrometer and an X-ray photometer, and performs a full-disk spectral measurement once per orbit. Comparison of TIMED/SEE measurements to contemporaneous satellite observations from the Student Nitric Oxide Explorer (SNOE) and a calibration rocket shows that solar irradiance in the XUV spectral range, from about 1 to 25 nm, is significantly more intense than previous observations. SEE solar spectra can be used as inputs to thermosphere/ionosphere models, including photoelectron/airglow models, thermosphere global mean models, and general circulation models. The resulting revisions to predicted photoelectron fluxes, ionization rates, electron density, ion composition, odd-nitrogen composition, and airglow emission rates show improved agreement with observations. We compare predictions to measurements for some of these, including ground based measurements of ionospheric parameters and airglow measurements by the TIMED global ultraviolet imager.

  12. EIT: Solar corona synoptic observations from SOHO with an Extreme-ultraviolet Imaging Telescope

    NASA Technical Reports Server (NTRS)

    Delaboudiniere, J. P.; Gabriel, A. H.; Artzner, G. E.; Michels, D. J.; Dere, K. P.; Howard, R. A.; Catura, R.; Stern, R.; Lemen, J.; Neupert, W.

    1988-01-01

    The Extreme-ultraviolet Imaging Telescope (EIT) of SOHO (solar and heliospheric observatory) will provide full disk images in emission lines formed at temperatures that map solar structures ranging from the chromospheric network to the hot magnetically confined plasma in the corona. Images in four narrow bandpasses will be obtained using normal incidence multilayered optics deposited on quadrants of a Ritchey-Chretien telescope. The EIT is capable of providing a uniform one arc second resolution over its entire 50 by 50 arc min field of view. Data from the EIT will be extremely valuable for identifying and interpreting the spatial and temperature fine structures of the solar atmosphere. Temporal analysis will provide information on the stability of these structures and identify dynamical processes. EIT images, issued daily, will provide the global corona context for aid in unifying the investigations and in forming the observing plans for SOHO coronal instruments.

  13. Angle-resolved scattering and reflectance of extreme-ultraviolet multilayer coatings: measurement and analysis

    SciTech Connect

    Schroeder, Sven; Herffurth, Tobias; Trost, Marcus; Duparre, Angela

    2010-03-20

    Roughness-induced light scattering critically affects the performance of optical components, in particular at short wavelengths. We present a stand-alone instrument for angle-resolved scattering and reflectance measurements at 13.5 nm in the extreme-ultraviolet (EUV) spectral range. The achieved dynamic range allows even the scattering of high-quality EUV mirrors on extremely smooth substrates to be investigated. For Mo/Si multilayers, total scatter losses of several percent have been observed, depending on the substrate qualities as well as on roughening and smoothing effects during coating. Different approximate models for estimating the impact of roughness on scatter losses are discussed and compared with experimental results.

  14. Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations

    SciTech Connect

    Naulleau, Patrick; George, Simi

    2011-01-26

    In the case of extreme ultraviolet (EUV) lithography, modeling has shown that reflector phase roughness on the lithographic mask is a significant concern due to the image plan speckle it causes and the resulting line-edge roughness on imaged features. Modeling results have recently been used to determine the requirements for future production worthy masks yielding the extremely stringent specification of 50 pm rms roughness. Owing to the scale of the problem in terms of memory requirements, past modeling results have all been based on the thin mask approximation. EUV masks, however, are inherently three dimensional in nature and thus the question arises as to the validity of the thin mask approximation. Here we directly compare image plane speckle calculation results using the fast two dimensional thin mask model to rigorous finite-difference time-domain results and find the two methods to be comparable.

  15. CAN A NANOFLARE MODEL OF EXTREME-ULTRAVIOLET IRRADIANCES DESCRIBE THE HEATING OF THE SOLAR CORONA?

    SciTech Connect

    Tajfirouze, E.; Safari, H.

    2012-01-10

    Nanoflares, the basic units of impulsive energy release, may produce much of the solar background emission. Extrapolation of the energy frequency distribution of observed microflares, which follows a power law to lower energies, can give an estimation of the importance of nanoflares for heating the solar corona. If the power-law index is greater than 2, then the nanoflare contribution is dominant. We model a time series of extreme-ultraviolet emission radiance as random flares with a power-law exponent of the flare event distribution. The model is based on three key parameters: the flare rate, the flare duration, and the power-law exponent of the flare intensity frequency distribution. We use this model to simulate emission line radiance detected in 171 A, observed by Solar Terrestrial Relation Observatory/Extreme-Ultraviolet Imager and Solar Dynamics Observatory/Atmospheric Imaging Assembly. The observed light curves are matched with simulated light curves using an Artificial Neural Network, and the parameter values are determined across the active region, quiet Sun, and coronal hole. The damping rate of nanoflares is compared with the radiative losses cooling time. The effect of background emission, data cadence, and network sensitivity on the key parameters of the model is studied. Most of the observed light curves have a power-law exponent, {alpha}, greater than the critical value 2. At these sites, nanoflare heating could be significant.

  16. AN AUTOMATIC DETECTION METHOD FOR EXTREME-ULTRAVIOLET DIMMINGS ASSOCIATED WITH SMALL-SCALE ERUPTION

    SciTech Connect

    Alipour, N.; Safari, H.; Innes, D. E.

    2012-02-10

    Small-scale extreme-ultraviolet (EUV) dimming often surrounds sites of energy release in the quiet Sun. This paper describes a method for the automatic detection of these small-scale EUV dimmings using a feature-based classifier. The method is demonstrated using sequences of 171 Angstrom-Sign images taken by the STEREO/Extreme UltraViolet Imager (EUVI) on 2007 June 13 and by Solar Dynamics Observatory/Atmospheric Imaging Assembly on 2010 August 27. The feature identification relies on recognizing structure in sequences of space-time 171 Angstrom-Sign images using the Zernike moments of the images. The Zernike moments space-time slices with events and non-events are distinctive enough to be separated using a support vector machine (SVM) classifier. The SVM is trained using 150 events and 700 non-event space-time slices. We find a total of 1217 events in the EUVI images and 2064 events in the AIA images on the days studied. Most of the events are found between latitudes -35 Degree-Sign and +35 Degree-Sign . The sizes and expansion speeds of central dimming regions are extracted using a region grow algorithm. The histograms of the sizes in both EUVI and AIA follow a steep power law with slope of about -5. The AIA slope extends to smaller sizes before turning over. The mean velocity of 1325 dimming regions seen by AIA is found to be about 14 km s{sup -1}.

  17. Optimizing laser produced plasmas for efficient extreme ultraviolet and soft X-ray light sources

    SciTech Connect

    Sizyuk, Tatyana; Hassanein, Ahmed

    2014-08-15

    Photon sources produced by laser beams with moderate laser intensities, up to 10{sup 14 }W/cm{sup 2}, are being developed for many industrial applications. The performance requirements for high volume manufacture devices necessitate extensive experimental research supported by theoretical plasma analysis and modeling predictions. We simulated laser produced plasma sources currently being developed for several applications such as extreme ultraviolet lithography using 13.5% ± 1% nm bandwidth, possibly beyond extreme ultraviolet lithography using 6.× nm wavelengths, and water-window microscopy utilizing 2.48 nm (La-α) and 2.88 nm (He-α) emission. We comprehensively modeled plasma evolution from solid/liquid tin, gadolinium, and nitrogen targets as three promising materials for the above described sources, respectively. Results of our analysis for plasma characteristics during the entire course of plasma evolution showed the dependence of source conversion efficiency (CE), i.e., laser energy to photons at the desired wavelength, on plasma electron density gradient. Our results showed that utilizing laser intensities which produce hotter plasma than the optimum emission temperatures allows increasing CE for all considered sources that, however, restricted by the reabsorption processes around the main emission region and this restriction is especially actual for the 6.× nm sources.

  18. 13 Years of SOHO/CELIAS/SEM Calibrated Solar Extreme Ultraviolet Irradiance Data

    NASA Astrophysics Data System (ADS)

    Judge, D.; Didkovsky, L.; Wieman, S.; Gangopadhyay, P.

    2008-12-01

    A verified and updated version of the calibrated SOHO/CELIAS/SEM (absolute) solar extreme ultraviolet (EUV) measurements from the beginning of the mission in 1996 through the present is available at the University of Southern California Space Sciences Center website. To complete this new version, six (1999- 2006) sounding rocket under-flights were analyzed using measurements from both a very stable Rare Gas (Ne) Ionization Cell (RGIC) and a clone of the flight SEM instrument. These sounding rocket under-flights have provided a number of reference points that have been compared with the solar flux data published on our web site (last revised in 2000). These reference points are in good agreement with the solar cycle EUV flux for the 30.4 nm first order (26 nm to 34 nm) SEM channels, indicating a very small (less than 1 percent) averaged difference from the published flux for the six under-flights. Thirteen years of continuous and accurate SEM data will continue to provide important information about short term (solar flares) and long term (solar cycle) changes of EUV solar irradiance, and will be used for advancing solar models, for more accurate Earth atmosphere drag models, ionization proxies, and atmospheric dynamics generally, and will also provide solar EUV measurement overlap with the new SDO Extreme ultraviolet Variability Experiment (EVE), to be launched in 2009.

  19. Spectral photometry of extreme helium stars: Ultraviolet fluxes and effective temperature

    NASA Technical Reports Server (NTRS)

    Drilling, J. S.; Schoenberner, D.; Heber, U.; Lynas-Gray, A. E.

    1982-01-01

    Ultraviolet flux distributions are presented for the extremely helium rich stars BD +10 deg 2179, HD 124448, LSS 3378, BD -9 deg 4395, LSE 78, HD 160641, LSIV -1 deg 2, BD 1 deg 3438, HD 168476, MV Sgr, LS IV-14 deg 109 (CD -35 deg 11760), LSII +33 deg 5 and BD +1 deg 4381 (LSIV +2 deg 13) obtained with the International Ultraviolet Explorer (IUE). Broad band photometry and a newly computed grid of line blanketed model atmospheres were used to determine accurate angular diameters and total stellar fluxes. The resultant effective temperatures are in most cases in satisfactory agreement with those based on broad band photometry and/or high resolution spectroscopy in the visible. For two objects, LSII +33 deg 5 and LSE 78, disagreement was found between the IUE observations and broadband photometry: the colors predict temperatures around 20,000 K, whereas the UV spectra indicate much lower photospheric temperatures of 14,000 to 15,000 K. The new temperature scale for extreme helium stars extends to lower effective temperatures than that of Heber and Schoenberner (1981) and covers the range from 8,500 K to 32,000 K.

  20. Breaking DNA strands by extreme-ultraviolet laser pulses in vacuum

    NASA Astrophysics Data System (ADS)

    Nováková, Eva; Vyšín, Luděk; Burian, Tomáš; Juha, Libor; Davídková, Marie; Múčka, Viliam; Čuba, Václav; Grisham, Michael E.; Heinbuch, Scott; Rocca, Jorge J.

    2015-04-01

    Ionizing radiation induces a variety of DNA damages including single-strand breaks (SSBs), double-strand breaks (DSBs), abasic sites, modified sugars, and bases. Most theoretical and experimental studies have been focused on DNA strand scissions, in particular production of DNA double-strand breaks. DSBs have been proven to be a key damage at a molecular level responsible for the formation of chromosomal aberrations, leading often to cell death. We have studied the nature of DNA damage induced directly by the pulsed 46.9-nm (26.5 eV) radiation provided by an extreme ultraviolet (XUV) capillary-discharge Ne-like Ar laser (CDL). Doses up to 45 kGy were delivered with a repetition rate of 3 Hz. We studied the dependence of the yield of SSBs and DSBs of a simple model of DNA molecule (pBR322) on the CDL pulse fluence. Agarose gel electrophoresis method was used for determination of both SSB and DSB yields. The action cross sections of the single- and double-strand breaks of pBR322 plasmid DNA in solid state were determined. We observed an increase in the efficiency of strand-break induction in the supercoiled DNA as a function of laser pulse fluence. Results are compared to those acquired at synchrotron radiation facilities and other sources of extreme-ultraviolet and soft x-ray radiation.

  1. LARGE-SCALE EXTREME-ULTRAVIOLET DISTURBANCES ASSOCIATED WITH A LIMB CORONAL MASS EJECTION

    SciTech Connect

    Dai, Y.; Auchere, F.; Vial, J.-C.; Tang, Y. H.; Zong, W. G.

    2010-01-10

    We present composite observations of a coronal mass ejection (CME) and the associated large-scale extreme-ultraviolet (EUV) disturbances on 2007 December 31 by the Extreme-ultraviolet Imager (EUVI) and COR1 coronagraph on board the recent Solar Terrestrial Relations Observatory mission. For this limb event, the EUV disturbances exhibit some typical characteristics of EUV Imaging Telescope waves: (1) in the 195 A bandpass, diffuse brightenings are observed propagating oppositely away from the flare site with a velocity of approx260 km s{sup -1}, leaving dimmings behind; (2) when the brightenings encounter the boundary of a polar coronal hole, they stop there to form a stationary front. Multi-temperature analysis of the propagating EUV disturbances favors a heating process over a density enhancement in the disturbance region. Furthermore, the EUVI-COR1 composite display shows unambiguously that the propagation of the diffuse brightenings coincides with a large lateral expansion of the CME, which consequently results in a double-loop-structured CME leading edge. Based on these observational facts, we suggest that the wave-like EUV disturbances are a result of magnetic reconfiguration related to the CME liftoff rather than true waves in the corona. Reconnections between the expanding CME magnetic field lines and surrounding quiet-Sun magnetic loops account for the propagating diffuse brightenings; dimmings appear behind them as a consequence of volume expansion. X-ray and radio data provide us with complementary evidence.

  2. Breaking DNA strands by extreme-ultraviolet laser pulses in vacuum.

    PubMed

    Nováková, Eva; Vyšín, Luděk; Burian, Tomáš; Juha, Libor; Davídková, Marie; Múčka, Viliam; Čuba, Václav; Grisham, Michael E; Heinbuch, Scott; Rocca, Jorge J

    2015-04-01

    Ionizing radiation induces a variety of DNA damages including single-strand breaks (SSBs), double-strand breaks (DSBs), abasic sites, modified sugars, and bases. Most theoretical and experimental studies have been focused on DNA strand scissions, in particular production of DNA double-strand breaks. DSBs have been proven to be a key damage at a molecular level responsible for the formation of chromosomal aberrations, leading often to cell death. We have studied the nature of DNA damage induced directly by the pulsed 46.9-nm (26.5 eV) radiation provided by an extreme ultraviolet (XUV) capillary-discharge Ne-like Ar laser (CDL). Doses up to 45 kGy were delivered with a repetition rate of 3 Hz. We studied the dependence of the yield of SSBs and DSBs of a simple model of DNA molecule (pBR322) on the CDL pulse fluence. Agarose gel electrophoresis method was used for determination of both SSB and DSB yields. The action cross sections of the single- and double-strand breaks of pBR322 plasmid DNA in solid state were determined. We observed an increase in the efficiency of strand-break induction in the supercoiled DNA as a function of laser pulse fluence. Results are compared to those acquired at synchrotron radiation facilities and other sources of extreme-ultraviolet and soft x-ray radiation. PMID:25974538

  3. Extreme ultraviolet spectroscopy of the planetary magnetospheres from the earth-orbiting satellite

    NASA Astrophysics Data System (ADS)

    Murakami, G.; Yoshioka, K.; Ishii, H.; Uji, K.; Yoshikawa, I.; Kagitani, M.; Tsuchiya, F.; Yamazaki, A.; Uemizu, K.

    2012-04-01

    The extreme ultraviolet (EUV) telescope (Extreme Ultraviolet Spectroscope for Exospheric Dynamics: EXCEED) onboard the Japan's small satellite (SPRINT-A) will be launched in 2013. The EXCEED instrument will obtain spectral images of tenuous gases and plasmas around the planets in the solar system (e.g., Mercury, Venus, Mars, Jupiter, and Saturn). One of the primary observation targets is Jupiter, whose magnetospheric plasma dynamics is dominated by planetary rotation. In the EUV range, a number of emission lines originate from plasmas in the Jupiter's inner magnetosphere. The EXCEED instrument is designed to have a wavelength range of 55-145 nm with a spectral resolution of 0.4-1.0 nm. The spectrograph slits have a field of view of 400 x 140 arc-seconds (maximum), and the attitude fluctuations are stabilized within 5 arc-seconds. The optics of the instrument consists of a primary mirror with a diameter of 20cm, a laminar type grating, and a 5-stage microchannel plate assembly with a resistive anode encoder. The surfaces of the primary mirror and the grating are coated with CVD-SiC. In this presentation, we report the general mission overview, the instrumentations, and the initial results of ground calibrations.

  4. [Design of optical system for solar extreme-ultraviolet imaging spectrometer].

    PubMed

    Liu, Zhuang; Gong, Yan

    2012-03-01

    Hyper-spectral imaging observation of the sun in the EUV region is an important method of research for solar's upper transition region, corona and plasma's physical property. Based on the application objective of solar extreme ultraviolet imaging spectrometer (SEUIS), combined with the current states of domestic and foreign extreme ultraviolet imaging spectrometer, a few of parameters for SEUIS design were drew up in the present paper. The advantages and disadvantages of all kinds of optical configurations were discussed,and the configuration of combination of telescope and spectrometer was chosen. The available main components were also described, off-axis parabolic mirror was chosen for telescope, and a high density uniform-line-space toroidal grating for dispersion device. The optical system which satisfies the performance parameters was designed. The design process, detailed parameters and results were presented in the end. The working wavelength of the optics system is 17.0-21.0 nm, the field of view is 1 228" x 1 024", the spatial resolution is 0.8 arc sec x pixel(-1), the spectral resolution is about 0.00198 nm x pixel(-1), and the total length of system is about 2.8 m. PMID:22582664

  5. Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography

    SciTech Connect

    Bajt, S; Clift, W M; Folta, J A; Gullikson, E M; Klebanoff, L E; Kleineberg, U; Malinowski, M E; Wedowski, M

    1999-08-05

    Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor industry in the production of sub-100 nm feature sizes in integrated circuits. Using multilayer reflective coatings optimized at wavelengths ranging from 11 to 14 nm, EUVL represents a potential successor to currently existing optical lithography techniques. In order to assess lifetimes of the multilayer coatings under realistic conditions, a series of radiation stability tests has been performed. In each run a dose of EUV radiation equivalent to several months of lithographic operation was applied to Mo/Si and MO/Be multilayer coatings within a few days. Depending on the residual gas concentration in the vacuum environment, surface deposition of carbon during the exposure lead to losses in the multilayer reflectivity. However, in none of the experimental runs was structural damage within the bulk of the multilayers observed. Mo/Si multilayer coatings recovered their full original reflectivity after removal of the carbon layer by an ozone cleaning method. Auger depth profiling on MO/Be multilayers indicate that carbon penetrated into the Be top layer during illumination with high doses of EUV radiation. Subsequent ozone cleaning fully removed the carbon, but revealed enhanced oxidation of the area illuminated, which led to an irreversible loss in reflectance on the order of 1%. Keywords: Extreme ultraviolet (EUV) lithography, multilayer reflective coatings, radiation stability, surface contamination

  6. Extreme Ultraviolet Radiation Measurement for Planetary Atmospheres/Magnetospheres from the Earth-Orbiting Spacecraft (Extreme Ultraviolet Spectroscope for Exospheric Dynamics: EXCEED)

    NASA Astrophysics Data System (ADS)

    Yoshikawa, Ichiro; Yoshioka, Kazuo; Murakami, Go; Yamazaki, Atsushi; Tsuchiya, Fuminori; Kagitani, Masato; Sakanoi, Takeshi; Terada, Naoki; Kimura, Tomoki; Kuwabara, Masaki; Fujiwara, Kuto; Hamaguchi, Tomoya; Tadokoro, Hiroyasu

    2014-11-01

    The Sprint-A satellite with the EUV spectrometer (Extreme Ultraviolet Spectroscope for Exospheric Dynamics: EXCEED) was launched in September 2013 by the Epsilon rocket. Now it is orbiting around the Earth (954.05 km×1156.87 km orbit; the period is 104 minutes) and one has started a broad and varied observation program. With an effective area of more than 1 cm2 and well-calibrated sensitivity in space, the EUV spectrometer will produce spectral images (520-1480 Å) of the atmospheres/magnetospheres of several planets (Mercury, Venus, Mars, Jupiter, and Saturn) from the Earth's orbit. At the first day of the observation, EUV emissions from the Io plasma torus (mainly sulfur ions) and aurora (H2 Lyman and Werner bands) of Jupiter have been identified. Continuous 3-month measurement for Io's plasma torus and aurora is planned to witness the sporadic and sudden brightening events occurring on one or both regions. For Venus, the Fourth Positive (A1 Π-X1 Σ +) system of CO and some yet known emissions of the atmosphere were identified even though the exposure was short (8-min). Long-term exposure from April to June (for approximately 2 months) will visualize the Venusian ionosphere and tail in the EUV spectral range. Saturn and Mars are the next targets.

  7. Transient charge dynamics in argon-cluster nanoplasmas created by intense extreme-ultraviolet free-electron-laser irradiation

    NASA Astrophysics Data System (ADS)

    Iwayama, H.; Harries, J. R.; Shigemasa, E.

    2015-02-01

    We present extreme-ultraviolet (EUV) fluorescence spectra of Ar clusters irradiated by intense EUV free-electron-laser (FEL) pulses focused to intensities of up to 3 ×1013W /cm2 at a wavelength of 51 nm. The spectra reveal fluorescence at wavelengths shorter than that of the incident radiation, which can be assigned to EUV fluorescence lines from excited multiply charged ions A rz +* with z as high as 6. This demonstrates that charge states as high as 7+ are produced by the FEL irradiation. The dependence of the spectra on cluster size shows that the highly charged ions are generated at the cluster surface, indicating inhomogeneous charging. The FEL power dependencies of the spectral features suggest that the inhomogeneous distribution of charge within the clusters reduces ionization thresholds at the cluster surface.

  8. Materials Properties and Solvated Electron Dynamics of Isolated Nanoparticles and Nanodroplets Probed with Ultrafast Extreme Ultraviolet Beams.

    PubMed

    Ellis, Jennifer L; Hickstein, Daniel D; Xiong, Wei; Dollar, Franklin; Palm, Brett B; Keister, K Ellen; Dorney, Kevin M; Ding, Chengyuan; Fan, Tingting; Wilker, Molly B; Schnitzenbaumer, Kyle J; Dukovic, Gordana; Jimenez, Jose L; Kapteyn, Henry C; Murnane, Margaret M

    2016-02-18

    We present ultrafast photoemission measurements of isolated nanoparticles in vacuum using extreme ultraviolet (EUV) light produced through high harmonic generation. Surface-selective static EUV photoemission measurements were performed on nanoparticles with a wide array of compositions, ranging from ionic crystals to nanodroplets of organic material. We find that the total photoelectron yield varies greatly with nanoparticle composition and provides insight into material properties such as the electron mean free path and effective mass. Additionally, we conduct time-resolved photoelectron yield measurements of isolated oleylamine nanodroplets, observing that EUV photons can create solvated electrons in liquid nanodroplets. Using photoemission from a time-delayed 790 nm pulse, we observe that a solvated electron is produced in an excited state and subsequently relaxes to its ground state with a lifetime of 151 ± 31 fs. This work demonstrates that femotosecond EUV photoemission is a versatile surface-sensitive probe of the properties and ultrafast dynamics of isolated nanoparticles. PMID:26807653

  9. Internal frequency conversion extreme ultraviolet interferometer using mutual coherence properties of two high-order-harmonic sources.

    PubMed

    Dobosz, S; Stabile, H; Tortora, A; Monot, P; Réau, F; Bougeard, M; Merdji, H; Carré, B; Martin, Ph; Joyeux, D; Phalippou, D; Delmotte, F; Gautier, J; Mercier, R

    2009-11-01

    We report on an innovative two-dimensional imaging extreme ultraviolet (XUV) interferometer operating at 32 nm based on the mutual coherence of two laser high order harmonics (HOH) sources, separately generated in gas. We give the first evidence that the two mutually coherent HOH sources can be produced in two independent spatially separated gas jets, allowing for probing centimeter-sized objects. A magnification factor of 10 leads to a micron resolution associated with a subpicosecond temporal resolution. Single shot interferograms with a fringe visibility better than 30% are routinely produced. As a test of the XUV interferometer, we measure a maximum electronic density of 3x10(20) cm(-3) 1.1 ns after the creation of a plasma on aluminum target. PMID:19947712

  10. Internal frequency conversion extreme ultraviolet interferometer using mutual coherence properties of two high-order-harmonic sources

    SciTech Connect

    Dobosz, S.; Stabile, H.; Tortora, A.; Monot, P.; Reau, F.; Bougeard, M.; Merdji, H.; Carre, B.; Martin, Ph.; Joyeux, D.; Phalippou, D.; Delmotte, F.; Gautier, J.; Mercier, R.

    2009-11-15

    We report on an innovative two-dimensional imaging extreme ultraviolet (XUV) interferometer operating at 32 nm based on the mutual coherence of two laser high order harmonics (HOH) sources, separately generated in gas. We give the first evidence that the two mutually coherent HOH sources can be produced in two independent spatially separated gas jets, allowing for probing centimeter-sized objects. A magnification factor of 10 leads to a micron resolution associated with a subpicosecond temporal resolution. Single shot interferograms with a fringe visibility better than 30% are routinely produced. As a test of the XUV interferometer, we measure a maximum electronic density of 3x10{sup 20} cm{sup -3} 1.1 ns after the creation of a plasma on aluminum target.

  11. Extreme ultraviolet lithography and three dimensional integrated circuit—A review

    NASA Astrophysics Data System (ADS)

    Wu, Banqiu; Kumar, Ajay

    2014-03-01

    Extreme ultraviolet lithography (EUVL) and three dimensional integrated circuit (3D IC) were thoroughly reviewed. Since proposed in 1988, EUVL obtained intensive studies globally and, after 2000, became the most promising next generation lithography method even though challenges were present in almost all aspects of EUVL technology. Commercial step-and-scan tools for preproduction are installed now with full field capability; however, EUV source power at intermediate focus (IF) has not yet met volume manufacturing requirements. Compared with the target of 200 W in-band power at IF, current tools can supply only approximately 40-55 W. EUVL resist has improved significantly in the last few years, with 13 nm line/space half-pitch resolution being produced with approximately 3-4 nm line width roughness (LWR), but LWR needs 2× improvement. Creating a defect-free EUVL mask is currently an obstacle. Actual adoption of EUVL for 22 nm and beyond technology nodes will depend on the extension of current optical lithography (193 nm immersion lithography, combined with multiple patterning techniques), as well as other methods such as 3D IC. Lithography has been the enabler for IC performance improvement by increasing device density, clock rate, and transistor rate. However, after the turn of the century, IC scaling resulted in short-channel effect, which decreases power efficiency dramatically, so clock frequency almost stopped increasing. Although further IC scaling by lithography reduces gate delay, interconnect delay and memory wall are dominant in determining the IC performance. 3D IC technology is a critical technology today because it offers a reasonable route to further improve IC performance. It increases device density, reduces the interconnect delay, and breaks memory wall with the application of 3D stacking using through silicon via. 3D IC also makes one chip package have more functional diversification than those enhanced only by shrinking the size of the features

  12. Extreme-ultraviolet radiation transport in small scale length laser-produced tin plasmas

    NASA Astrophysics Data System (ADS)

    Sequoia, Kevin Lamar Williams

    The majority of the studies on laser-produced plasmas as an efficient extreme ultraviolet (EUV) light source have focused on relatively large plasmas produced at large laser facilities. However, to develop a commercially viable light source for EUV lithography, much smaller lasers and hence much smaller plasmas must be employed. Smaller plasmas behave quite differently than large plasmas in that the temperature and density are less uniform, and lateral expansion is more important. These differences affect the energy transport and, in particular, the radiation transport. This work studies the EUV radiation transport in small scale length tin plasmas, focusing on the effects of target geometry and laser pulse duration. Both planar and spherical tin targets were irradiated with an Nd:YAG laser operating at 1.064 microm. Conversion efficiency of laser light to 13.5 nm radiation (in-band), EUV emission spectrum, two-dimensional in-band emission profile, and the plasma electron density were measured experimentally. These measurements provide insight into where the laser is absorbed, where the in-band emission is produced, and how the radiation is transmitted. The plasma evolution in these experiments were simulated with a two-dimensional radiation hydrodynamic code, while the radiation transport and atomic kinetics where modeled with a collisional radiative code. Additional experiments were conducted using planar targets where the pulse duration was varied from 0.5 ns to 16 ns to understand the effects of laser pulse duration. It was found that the optimum plasma temperature for efficient generation and transmission of in-band emission is 20 eV. This is lower than the previously reported optimum temperature of 30 eV. The use of a 1.064 microm heating laser results in overheating of the plasma in a region that is much too dense to transmit the in-band emission. This overheating is necessary for the plasma to reach the optimum temperature in the region where the density is

  13. Two-colour pump–probe experiments with a twin-pulse-seed extreme ultraviolet free-electron laser

    PubMed Central

    Allaria, E.; Bencivenga, F.; Borghes, R.; Capotondi, F.; Castronovo, D.; Charalambous, P.; Cinquegrana, P.; Danailov, M. B.; De Ninno, G.; Demidovich, A.; Di Mitri, S.; Diviacco, B.; Fausti, D.; Fawley, W. M.; Ferrari, E.; Froehlich, L.; Gauthier, D.; Gessini, A.; Giannessi, L.; Ivanov, R.; Kiskinova, M.; Kurdi, G.; Mahieu, B.; Mahne, N.; Nikolov, I.; Masciovecchio, C.; Pedersoli, E.; Penco, G.; Raimondi, L.; Serpico, C.; Sigalotti, P.; Spampinati, S.; Spezzani, C.; Svetina, C.; Trovò, M.; Zangrando, M.

    2013-01-01

    Exploring the dynamics of matter driven to extreme non-equilibrium states by an intense ultrashort X-ray pulse is becoming reality, thanks to the advent of free-electron laser technology that allows development of different schemes for probing the response at variable time delay with a second pulse. Here we report the generation of two-colour extreme ultraviolet pulses of controlled wavelengths, intensity and timing by seeding of high-gain harmonic generation free-electron laser with multiple independent laser pulses. The potential of this new scheme is demonstrated by the time evolution of a titanium-grating diffraction pattern, tuning the two coherent pulses to the titanium M-resonance and varying their intensities. This reveals that an intense pulse induces abrupt pattern changes on a time scale shorter than hydrodynamic expansion and ablation. This result exemplifies the essential capabilities of the jitter-free multiple-colour free-electron laser pulse sequences to study evolving states of matter with element sensitivity. PMID:24048228

  14. Ultraviolet-assisted microfluidic generation of ferroelectric composite particles.

    PubMed

    Zhang, Cancan; Yu, Xiaolei; You, Sujian; Cai, Bo; Liu, Huiqin; Zhang, Lingling; Rao, Lang; Liu, Wei; Guo, Shi-Shang; Zhao, Xing-Zhong

    2016-03-01

    We report on the feasible fabrication of microfluidic devices for ferroelectric polymers' synthesis in a rapid and stable fashion. Utilizing micro-mixing and flow-focusing in microchannels, poly(vinylidene fluoride-trifluoroethylene) and copper phthalocyanine are uniformly dispersed in one hydrogel particle, which are then demonstrated to immediate and complete on-chip steady polymerization by moderate ultraviolet treatment. The advantage of our droplet-based microfluidic devices is generating versatile particles from simple spheres to disks or rods, and the lengths of particles can be precisely tuned from 30 to 400 μm through adjusting the flow rates of both disperse and oil phases. In addition, this mixed technique allows for the continuous production of dielectric microparticles with controlled dielectric properties between 10 and 160. Such a microfluidic device offers a flexible platform for multiferroic applications. PMID:27042248

  15. Ion debris characterization from a z-pinch extreme ultraviolet light source

    SciTech Connect

    Antonsen, Erik L.; Thompson, Keith C.; Hendricks, Matthew R.; Alman, Darren A.; Jurczyk, Brian E.; Ruzic, D.N.

    2006-03-15

    An XTREME Technologies XTS 13-35 extreme ultraviolet (EUV) light source creates a xenon z pinch that generates 13.5 nm light. Due to the near x-ray nature of light at this wavelength, extremely smooth metal mirrors for photon collection must be employed. These are exposed to the source debris. Dissolution of the z-pinch gas column results in high-energy ion and neutral release throughout the chamber that can have adverse effects on mirror surfaces. The XTREME commercial EUV emission diagnostic chamber was designed to maximize diagnostic access to the light and particulate emissions from the z pinch. The principal investigation is characterization of the debris field and the erosive effects on optics present. Light emission from the z pinch is followed by ejection of multiply charged ions and fast neutral particles that make up an erosive flux to chamber surfaces. Attenuation of this erosive flux to optical surfaces is attempted by inclusion of a debris mitigation tool consisting of foil traps and neutral buffer gas flow. Characterization of the z-pinch ejecta is performed with a spherical sector energy analyzer (ESA) that diagnoses fast ion species by energy-to-charge ratio using ion time-of-flight (ITOF) analysis. This is used to evaluate the debris tool's ability to divert direct fast ions from impact on optic surfaces. The ITOF-ESA is used to characterize both the energy and angular distribution of the direct fast ions. Xe{sup +} up to Xe{sup +4} ions have been characterized along with Ar{sup +} (the buffer gas used), W{sup +}, Mo{sup +}, Si{sup +}, Fe{sup +}, and Ni{sup +}. Energy spectra for these species from 0.5 up to 13 keV are defined at 20 deg. and 30 deg. from the pinch centerline in the chamber. Results show a drop in ion flux with angular increase. The dominant species is Xe{sup +} which peaks around 8 keV. Ion flux measured against buffer gas flow rate suggests that the direct fast ion population is significantly attenuated through increases in buffer

  16. Ion debris characterization from a z-pinch extreme ultraviolet light source

    NASA Astrophysics Data System (ADS)

    Antonsen, Erik L.; Thompson, Keith C.; Hendricks, Matthew R.; Alman, Darren A.; Jurczyk, Brian E.; Ruzic, D. N.

    2006-03-01

    An XTREME Technologies XTS 13-35 extreme ultraviolet (EUV) light source creates a xenon z pinch that generates 13.5 nm light. Due to the near x-ray nature of light at this wavelength, extremely smooth metal mirrors for photon collection must be employed. These are exposed to the source debris. Dissolution of the z-pinch gas column results in high-energy ion and neutral release throughout the chamber that can have adverse effects on mirror surfaces. The XTREME commercial EUV emission diagnostic chamber was designed to maximize diagnostic access to the light and particulate emissions from the z pinch. The principal investigation is characterization of the debris field and the erosive effects on optics present. Light emission from the z pinch is followed by ejection of multiply charged ions and fast neutral particles that make up an erosive flux to chamber surfaces. Attenuation of this erosive flux to optical surfaces is attempted by inclusion of a debris mitigation tool consisting of foil traps and neutral buffer gas flow. Characterization of the z-pinch ejecta is performed with a spherical sector energy analyzer (ESA) that diagnoses fast ion species by energy-to-charge ratio using ion time-of-flight (ITOF) analysis. This is used to evaluate the debris tool's ability to divert direct fast ions from impact on optic surfaces. The ITOF-ESA is used to characterize both the energy and angular distribution of the direct fast ions. Xe+ up to Xe+4 ions have been characterized along with Ar+ (the buffer gas used), W+, Mo+, Si+, Fe+, and Ni+. Energy spectra for these species from 0.5 up to 13 keV are defined at 20° and 30° from the pinch centerline in the chamber. Results show a drop in ion flux with angular increase. The dominant species is Xe+ which peaks around 8 keV. Ion flux measured against buffer gas flow rate suggests that the direct fast ion population is significantly attenuated through increases in buffer gas flow rate. This does not address momentum transfer from

  17. Measurement of CO2 laser absorption by tin plasma emanating extreme ultraviolet light for photo-lithography

    NASA Astrophysics Data System (ADS)

    Matsukuma, Hiraku; Yoshida, Kensuke; Hosoda, Tatsuya; Yogo, Akifumi; Fujioka, Shinsuke; Nishihara, Katsunobu; Sunahara, Atsushi; Somekawa, Toshihiro; Nishimura, Hiroaki

    2014-10-01

    Laser-driven tin plasma has been studied as a light source of extreme ultraviolet (EUV) at 13.5 nm (+/- 1% in-band width) for the next-generation semiconductor manufacturing. By using CO2 laser as a driver, high conversion efficiency (CE) has been attained in previous works by optimizing optical thickness for EUV radiation. Radiation hydorodynamic simulation predicts, however, that absorption coefficient for CO2 laser is as high as 50% for a tin plasma generated with a single laser pulse mainly due to short plasma scale. The relatively low absorption is a crucial problem for efficient generation of EUV light. In order to solve this problem and to increase the energy absorption, a double pulse method has been proposed where plasma scale length is extended by pre-pulse irradiation. Therefore, it is important to measure CO2 laser absorption rate precisely in order to optimize plasma conditions. For this purpose we designed an integrating sphere for CO2 laser. Laser absorption was measured for tin plasmas generated under various conditions including target geometries. We will show experimental results and discuss on guidelines for getting higher CE. This study has been partly supported by Strategic Innovation Program for Energy Conservation Technologies in 2013 from New Energy and Industrial Technology Development Organization (NEDO) of Japan.

  18. The extreme ultraviolet spectrum of the kinetically dominated quasar 3C 270.1

    NASA Astrophysics Data System (ADS)

    Punsly, Brian; Marziani, Paola

    2015-10-01

    Only a handful of quasars have been identified as kinetically dominated, their long-term time-averaged jet power, overline{Q}, exceeds the bolometric thermal emission, Lbol, associated with the accretion flow. This Letter presents the first extreme ultraviolet (EUV) spectrum of a kinetically dominated quasar, 3C 270.1. The EUV continuum flux density of 3C 270.1 is very steep, F_{ν } ˜ ν ^{-α _{EUV}}, αEUV = 2.98 ± 0.15. This value is consistent with the correlation of overline{Q}/L_{bol} and αEUV found in previous studies of the EUV continuum of quasars, the EUV deficit of radio loud quasars. Curiously, although ultraviolet broad absorption line (BAL) troughs in quasar spectra are anticorrelated with overline{Q}, 3C 270.1 has been considered a BAL quasar based on an SDSS spectrum. This claim is examined in terms of the EUV spectrum of O VI and the highest resolution C IV spectrum in the archival data and the SDSS spectrum. First, from [O III]4959,5007 (IR) observations and the UV spectral lines, it is concluded that the correct redshift for 3C 270.1 is 1.5266. It is then found that the standard measure of broad absorption, BALnicity = 0, for Mg II 2800, C IV 1549 and O VI 1032 in all epochs.

  19. Photoionization capable, extreme and vacuum ultraviolet emission in developing low temperature plasmas in air

    NASA Astrophysics Data System (ADS)

    Stephens, J.; Fierro, A.; Beeson, S.; Laity, G.; Trienekens, D.; Joshi, R. P.; Dickens, J.; Neuber, A.

    2016-04-01

    Experimental observation of photoionization capable extreme ultraviolet and vacuum ultraviolet emission from nanosecond timescale, developing low temperature plasmas (i.e. streamer discharges) in atmospheric air is presented. Applying short high voltage pulses enabled the observation of the onset of plasma formation exclusively by removing the external excitation before spark development was achieved. Contrary to the common assumption that radiative transitions from the b{{}1}{{\\Pi}u} (Birge-Hopfield I) and b{{}\\prime 1}Σu+ (Birge-Hopfield II) singlet states of N2 are the primary contributors to photoionization events, these results indicate that radiative transitions from the c{{4\\prime}1}Σu+ (Carroll-Yoshino) singlet state of N2 are dominant in developing low temperature plasmas in air. In addition to c{}4\\prime transitions, photoionization capable transitions from atomic and singly ionized atomic oxygen were also observed. The inclusion of c{{4\\prime}1}Σu+ transitions into a statistical photoionization model coupled with a fluid model enabled streamer growth in the simulation of positive streamers.

  20. Analysis of observational data from Extreme Ultra-Violet Camera onboard Chang'E-3 mission

    NASA Astrophysics Data System (ADS)

    Yan, Yan; Wang, Hua-Ning; He, Han; He, Fei; Chen, Bo; Feng, Jian-Qing; Ping, Jin-Song; Shen, Chao; Xu, Rong-Lan; Zhang, Xiao-Xin

    2016-02-01

    The Extreme Ultra-Violet Camera (hereafter EUVC) is a scientific payload onboard the lander of the Chang'E-3 (hereafter CE-3) mission launched on December 1st, 2013. Centering on a spectral band around 30.4 nm, EUVC provides the global images of the Earth's plasmasphere from the meridian view, with a spatial resolution of 0.1 R_{oplus} in 150 × 150 pixels and a cadence of 10 minutes. Along with the data being publicly released online, some unsettled issues in the early stage have been clarified, including the geometrical preparations, the refined approach on the coefficient K for the background, and the alignment among the images. A demo of data after all the above processes is therefore presented as a guidance for users who are studying the structure and dynamics of the plasmasphere.

  1. Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology.

    PubMed

    Naulleau, P P; Goldberg, K A; Batson, P J; Jeong, S; Underwood, J H

    2001-08-01

    The recent interest in extreme-ultraviolet (EUV) lithography has led to the development of an array of at-wavelength metrologies implemented on synchrotron beamlines. These beamlines commonly use Kirkpatrick-Baez (K-B) systems consisting of two perpendicular, elliptically bent mirrors in series. To achieve high-efficiency focusing into a small spot, unprecedented fabrication and assembly tolerance is required of these systems. Here we present a detailed error-budget analysis and develop a set of specifications for diffraction-limited performance for the K-B optic operating on the EUV interferometry beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. The specifications are based on code v modeling tools developed explicitly for these optical systems. Although developed for one particular system, the alignment sensitivities presented here are relevant to K-B system designs in general. PMID:18360402

  2. Three-dimensional extreme ultraviolet emission from a droplet-based laser-produced plasma

    SciTech Connect

    Giovannini, A. Z.; Abhari, Reza S.

    2013-07-21

    The emission of extreme ultraviolet radiation in a 2% bandwidth centered at 13.5 nm (in-band) is measured in one hemisphere. The targets of the laser are tin droplets. In-band emission is measured at angles from the laser axis larger than 120 Degree-Sign . Analytical models representing the physical processes are developed and calibrated with the experimental data. In the models two assumptions are investigated, isentropic and isothermal 2D-axisymmetric expansion. The parameters of the models are the density distribution of the plasma and the location where the EUV emission is centered. The parameters are inferred by the calibration of the models with the experimental data. The predictions of the models are validated with experiments where slab targets were used.

  3. Analysis of extreme-ultraviolet observations of a polar coronal hole

    NASA Technical Reports Server (NTRS)

    Mariska, J. T.

    1978-01-01

    Emission gradient curves for extreme-ultraviolet resonance lines of lithiumlike ions have been constructed from spectroheliograms of a northern polar coronal hole observed on August 14, 1973, with the Harvard experiment on Skylab. An emission-measure analysis indicates both reduced density and coronal temperature in the coronal hole. The boundary geometry of the coronal hole is determined, and a temperature-density model that is consistent with the observed intensities is constructed. The model gives a conductive flux of 60,000 erg/sq cm per sec at 1.03 solar radii. The boundary geometry and density distribution are combined with typical solar-wind parameters at the earth to determine an outflow velocity of 15 km/s at 1.08 solar radii.

  4. Extreme Ultra-Violet Spectroscopy of the Lower Solar Atmosphere During Solar Flares (Invited Review)

    NASA Astrophysics Data System (ADS)

    Milligan, Ryan O.

    2015-12-01

    The extreme ultra-violet (EUV) portion of the solar spectrum contains a wealth of diagnostic tools for probing the lower solar atmosphere in response to an injection of energy, particularly during the impulsive phase of solar flares. These include temperature- and density-sensitive line ratios, Doppler-shifted emission lines, nonthermal broadening, abundance measurements, differential emission measure profiles, continuum temperatures and energetics, among others. In this article I review some of the recent advances that have been made using these techniques to infer physical properties of heated plasma at footpoint and ribbon locations during the initial stages of solar flares. I primarily focus on studies that have utilised spectroscopic EUV data from Hinode/EUV Imaging Spectrometer (EIS) and Solar Dynamics Observatory/EUV Variability Experiment (SDO/EVE), and I also provide some historical background and a summary of future spectroscopic instrumentation.

  5. Correlated proton-electron hole dynamics in protonated water clusters upon extreme ultraviolet photoionization

    DOE PAGESBeta

    Li, Zheng; Vendrell, Oriol

    2016-01-13

    The ultrafast nuclear and electronic dynamics of protonated water clusters H+(H2O)n after extreme ultraviolet photoionization is investigated. In particular, we focus on cluster cations with n = 3, 6, and 21. Upon ionization, two positive charges are present in the cluster related to the excess proton and the missing electron, respectively. A correlation is found between the cluster's geometrical conformation and initial electronic energy with the size of the final fragments produced. As a result, for situations in which the electron hole and proton are initially spatially close, the two entities become correlated and separate in a time-scale of 20more » to 40 fs driven by strong non-adiabatic effects.« less

  6. Correlated proton-electron hole dynamics in protonated water clusters upon extreme ultraviolet photoionization.

    PubMed

    Li, Zheng; Vendrell, Oriol

    2016-07-01

    The ultrafast nuclear and electronic dynamics of protonated water clusters H(+)(H2O) n after extreme ultraviolet photoionization is investigated. In particular, we focus on cluster cations with n = 3, 6, and 21. Upon ionization, two positive charges are present in the cluster related to the excess proton and the missing electron, respectively. A correlation is found between the cluster's geometrical conformation and initial electronic energy with the size of the final fragments produced. For situations in which the electron hole and proton are initially spatially close, the two entities become correlated and separate in a time-scale of 20 to 40 fs driven by strong non-adiabatic effects. PMID:26798842

  7. Comparison of solar spectra from the Hinode extreme-ultraviolet imaging spectrometer (EIS) to preflight calibrations

    NASA Astrophysics Data System (ADS)

    Seely, John; Feldman, Uri; Brown, Charles; Doschek, George; Hara, H.

    2007-09-01

    The Extreme-Ultraviolet Imaging Spectrometer (EIS) on the Hinode satellite records high-resolution solar spectra in the 170-210 Å and 246-290 Å wavelength ranges. The EIS optics operate at near normal incidence and consist of an off-axis parabolic mirror, a toroidal diffraction grating, two CCD detectors, and two thin aluminum filters. To increase the normal incidence efficiency, high-reflectance multilayer interference coatings were deposited on the mirror and the grating. Prior to launch, each of the optical components was calibrated using synchrotron radiation, and the spectral and spatial resolution of the complete instrument were measured. In this paper, we compare the preflight calibrations with the first-light spectra recorded in space.

  8. Extreme Ultraviolet Explorer observations of the RS Canum Venaticorum systems AR Lacertae and II Pegasi

    NASA Technical Reports Server (NTRS)

    Petterer, R. J.; Vedder, P. W.; Jelinsky, P.; Brown, A.; Bowyer, S.

    1993-01-01

    We report observations of two RS CVn systems, II Peg and AR Lac, which were calibration targets during the in-orbit checkout phase of the Extreme Ultraviolet Explorer (EUVE). We have determined count rates, and, based on these count rates, preliminary emission measure analyses have been done. The Lexan/boron band count rates were 0.0849 +/- 0.0023 counts/s for AR Lac and 0.218 +/- 0.031 counts/s for II Peg during its quiescent state. Temperatures and emission measures derived from the EUVE data are consistent with previously published values. We also report a flare seen during the II Peg observations which has characteristics similar to previously observed flares on II Peg. During the flare the Lexan/boron count rate increased by at least a factor of 2.5, and the minimum total duration was about 34,000 s (about 9.4 hr).

  9. Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography

    DOEpatents

    Stearns, Daniel G.; Sweeney, Donald W.; Mirkarimi, Paul B.

    2004-11-23

    A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. This can be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film, producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflected field. For example, when the structural modification is a localized film contraction, the repair of a defect consists of flattening a mound or spreading out the sides of a depression.

  10. Complementary ion and extreme ultra-violet spectrometer for laser-plasma diagnosis

    SciTech Connect

    Ter-Avetisyan, S.; Ramakrishna, B.; Doria, D.; Sarri, G.; Zepf, M.; Borghesi, M.; Ehrentraut, L.; Stiel, H.; Steinke, S.; Schnuerer, M.; Nickles, P. V.; Sandner, W.; Priebe, G.

    2009-10-15

    Simultaneous detection of extreme ultra-violet (XUV) and ion emission along the same line of sight provides comprehensive insight into the evolution of plasmas. This type of combined spectroscopy is applied to diagnose laser interaction with a spray target. The use of a micro-channel-plate detector assures reliable detection of both XUV and ion signals in a single laser shot. The qualitative analysis of the ion emission and XUV spectra allows to gain detailed information about the plasma conditions, and a correlation between the energetic proton emission and the XUV plasma emission can be suggested. The measured XUV emission spectrum from water spray shows efficient deceleration of laser accelerated electrons with energies up to keV in the initially cold background plasma and the collisional heating of the plasma.

  11. USING HINODE/EXTREME-ULTRAVIOLET IMAGING SPECTROMETER TO CONFIRM A SEISMOLOGICALLY INFERRED CORONAL TEMPERATURE

    SciTech Connect

    Marsh, M. S.; Walsh, R. W.

    2009-11-20

    The Extreme-Ultraviolet Imaging Spectrometer on board the HINODE satellite is used to examine the loop system described in Marsh et al. by applying spectroscopic diagnostic methods. A simple isothermal mapping algorithm is applied to determine where the assumption of isothermal plasma may be valid, and the emission measure locii technique is used to determine the temperature profile along the base of the loop system. It is found that, along the base, the loop has a uniform temperature profile with a mean temperature of 0.89 +- 0.09 MK which is in agreement with the temperature determined seismologically in Marsh et al., using observations interpreted as the slow magnetoacoustic mode. The results further strengthen the slow mode interpretation, propagation at a uniform sound speed, and the analysis method applied in Marsh et al. It is found that it is not possible to discriminate between the slow mode phase speed and the sound speed within the precision of the present observations.

  12. Evidence of partial temporal coherence effects in the linear autocorrelation of extreme ultraviolet laser pulses.

    PubMed

    Le Marec, Andréa; Guilbaud, Olivier; Larroche, Olivier; Klisnick, Annie

    2016-07-15

    We study how the degree of temporal coherence of plasma-based extreme ultraviolet lasers operated in the amplification of the spontaneous emission mode is encoded in the shape of the linear autocorrelation function, which is obtained from the variation of the fringe visibility while varying the delay in a variable path-difference interferometer. We discuss the implications of this effect when the technique is used to infer the spectral properties of the source. Our numerical simulations, based on a partial coherence model developed by other authors for x-ray free electron lasers, are in good agreement with previously reported sets of measurements, illustrating similar statistical properties for both sources. PMID:27420542

  13. Enhanced nonlinear double excitation of He in intense extreme ultraviolet laser fields.

    PubMed

    Hishikawa, A; Fushitani, M; Hikosaka, Y; Matsuda, A; Liu, C-N; Morishita, T; Shigemasa, E; Nagasono, M; Tono, K; Togashi, T; Ohashi, H; Kimura, H; Senba, Y; Yabashi, M; Ishikawa, T

    2011-12-01

    Nonlinear, three-photon double excitation of He in intense extreme ultraviolet free-electron laser fields (∼24.1  eV, ∼5  TW/cm2) is presented. Resonances to the doubly excited states converging to the He+ N=3 level are revealed by the shot-by-shot photoelectron spectroscopy and identified by theoretical calculations based on the time-dependent Schrödinger equation for the two-electron atom under a laser field. It is shown that the three-photon double excitation is enhanced by intermediate Rydberg states below the first ionization threshold, giving a greater contribution to the photoionization yields than the two-photon process by more than 1 order of magnitude. PMID:22242995

  14. NRL-ATM extreme ultraviolet solar image TV monitor flown on Skylab

    NASA Technical Reports Server (NTRS)

    Crockett, W. R.; Purcell, J. D.; Schumacher, R. J.; Tousey, R.; Patterson, N. P.

    1977-01-01

    An instrument for recording extreme ultraviolet television images of the sun was flown in the Apollo Telescope Mount on Skylab. Solar radiation in the 171-630 A wavelength range, defined by the transmission band of three thin-film aluminum filters, was focused onto a p-quaterphenyl photon conversion layer by a platinum-coated mirror at normal incidence. The conversion layer was attached to the faceplate of a low light level SEC vidicon. An onboard video monitor enabled the Skylab crews to observe the images in real-time and to identify and follow the development of solar features. Images were also transmitted to the mission control center, where they were used in planning the ATM observing schedule.

  15. The diffuse extreme-ultraviolet background - Constraints on hot coronal plasma

    NASA Technical Reports Server (NTRS)

    Paresce, F.; Stern, R.

    1981-01-01

    The Apollo-Soyuz data and data reported by Cash et al. (1976) have been reanalyzed in terms of both isothermal models and temperature distribution models. In the latter case, a power-law form is assumed for the relation between emission measure and temperature. A new upper limit on diffuse flux in the 20-73 eV band derived from Apollo-Soyuz observations made in the earth's shadow has been incorporated in the calculation. In the considered investigation the results of the new analysis are presented and the implications for the physical properties of the hot component of the interstellar medium are discussed. The analysis of the Berkeley extreme ultraviolet (EUV) diffuse background measurements using either isothermal or power law temperature distribution models for the emitting plasma indicates excellent qualitative agreement with hard X-ray data that suggest the sun to be immersed in a hot plasma that pervades most of space out to approximately 100 pc.

  16. Spectral purification and infrared light recycling in extreme ultraviolet lithography sources.

    PubMed

    Bayraktar, Muharrem; van Goor, Fred A; Boller, Klaus J; Bijkerk, Fred

    2014-04-01

    We present the design of a novel collector mirror for laser produced plasma (LPP) light sources to be used in extreme ultraviolet (EUV) lithography. The design prevents undesired infrared (IR) drive laser light, reflected from the plasma, from reaching the exit of the light source. This results in a strong purification of the EUV light, while the reflected IR light becomes refocused into the plasma for enhancing the IR-to-EUV conversion. The dual advantage of EUV purification and conversion enhancement is achieved by incorporating an IR Fresnel zone plate pattern into the EUV reflective multilayer coating of the collector mirror. Calculations using Fresnel-Kirchhoff's diffraction theory for a typical collector design show that the IR light at the EUV exit is suppressed by four orders of magnitude. Simultaneously, 37% of the reflected IR light is refocused back the plasma. PMID:24718234

  17. Correlated proton-electron hole dynamics in protonated water clusters upon extreme ultraviolet photoionization

    PubMed Central

    Li, Zheng; Vendrell, Oriol

    2016-01-01

    The ultrafast nuclear and electronic dynamics of protonated water clusters H+(H2O)n after extreme ultraviolet photoionization is investigated. In particular, we focus on cluster cations with n = 3, 6, and 21. Upon ionization, two positive charges are present in the cluster related to the excess proton and the missing electron, respectively. A correlation is found between the cluster's geometrical conformation and initial electronic energy with the size of the final fragments produced. For situations in which the electron hole and proton are initially spatially close, the two entities become correlated and separate in a time-scale of 20 to 40 fs driven by strong non-adiabatic effects. PMID:26798842

  18. Data processing and initial results from the CE-3 Extreme Ultraviolet Camera

    NASA Astrophysics Data System (ADS)

    Feng, Jian-Qing; Liu, Jian-Jun; He, Fei; Yan, Wei; Ren, Xin; Tan, Xu; He, Ling-Ping; Chen, Bo; Zuo, Wei; Wen, Wei-Bin; Su, Yan; Zou, Yong-Liao; Li, Chun-Lai

    2014-12-01

    The Extreme Ultraviolet Camera (EUVC) onboard the Chang'e-3 (CE-3) lander is used to observe the structure and dynamics of Earth's plasmasphere from the Moon. By detecting the resonance line emission of helium ions (He+) at 30.4 nm, the EUVC images the entire plasmasphere with a time resolution of 10 min and a spatial resolution of about 0.1 Earth radius (RE) in a single frame. We first present details about the data processing from EUVC and the data acquisition in the commissioning phase, and then report some initial results, which reflect the basic features of the plasmasphere well. The photon count and emission intensity of EUVC are consistent with previous observations and models, which indicate that the EUVC works normally and can provide high quality data for future studies.

  19. Resonant two-photon absorption of extreme-ultraviolet free-electron-laser radiation in helium

    SciTech Connect

    Nagasono, Mitsuru; Suljoti, Edlira; Pietzsch, Annette; Hennies, Franz; Wellhoefer, Michael; Hoeft, Jon-Tobias; Martins, Michael; Wurth, Wilfried; Foehlisch, Alexander; Treusch, Rolf; Feldhaus, Josef; Schneider, Jochen R.

    2007-05-15

    We have investigated the nonlinear response of helium to intense extreme-ultraviolet radiation from the free-electron laser in Hamburg (FLASH). We observe a spectral feature between 24 and 26 eV electron kinetic energy in photoemission which shows a quadratic fluence dependence. The feature is explained as a result of subsequent processes involving a resonant two-photon absorption process into doubly excited levels of even parity (N=5 and 6), radiative decay to the doubly excited states in the vicinity of the He{sup +} (N=2) ionization threshold and finally the photoionization of the inner electron by the radiation of the next microbunches. This observation suggests that even-parity states, which have been elusive to be measured with the low pulse energy of synchrotron radiation sources, can be investigated with the intense radiation of FLASH. This also demonstrates a first step to bring nonlinear spectroscopy into the xuv and soft-x-ray regime.

  20. Electron-Impact-Induced Emission Cross Sections of Neon in the Extreme Ultraviolet

    NASA Technical Reports Server (NTRS)

    Kanik, I.; Ajello, J. M.; James, G. K.

    1996-01-01

    We have measured the extreme ultraviolet (EUV) spectrum of neon produced by electron excitation. The measurements were obtained under optically thin conditions, and at a spectral resolution of 0.5 nm full width at half maximum (FWHM). The most prominent features of the EUV spectrum between 45-80 nm are the resonance lines of Ne I at 73.6 and 74.4 nm and a multiplet of Ne II at 46.14 nm (the average value for the line center of the two closely spaced ion lines at 46.07 and 46.22 nm). Absolute emission cross sections of these lines at 300 eV were measured and compared to other previous measurements.

  1. The ion microscope as a tool for quantitative measurements in the extreme ultraviolet

    PubMed Central

    Tsatrafyllis, N.; Bergues, B.; Schröder, H.; Veisz, L.; Skantzakis, E.; Gray, D.; Bodi, B.; Kuhn, S.; Tsakiris, G. D.; Charalambidis, D.; Tzallas, P.

    2016-01-01

    We demonstrate a tool for quantitative measurements in the extreme ultraviolet (EUV) spectral region measuring spatially resolved atomic ionization products at the focus of an EUV beam. The ionizing radiation is a comb of the 11th–15th harmonics of a Ti:Sapphire femtosecond laser beam produced in a Xenon gas jet. The spatial ion distribution at the focus of the harmonics is recorded using an ion microscope. Spatially resolved single- and two-photon ionization products of Argon and Helium are observed. From such ion distributions single- and two-photon generalized cross sections can be extracted by a self-calibrating method. The observation of spatially resolved two-EUV-photon ionization constitutes an initial step towards future single-shot temporal characterization of attosecond pulses. PMID:26868370

  2. The expansion velocities of laser-produced plasmas determined from extreme ultraviolet spectral line profiles

    NASA Technical Reports Server (NTRS)

    Feldman, U.; Doschek, G. A.; Behring, W. E.; Cohen, L.

    1977-01-01

    The expansion of laser-produced plasma is determined from the shapes of spectral lines of highly ionized iron emitted in the extreme ultraviolet. The plasmas were produced by focusing the pulse from a Nd:glass laser onto solid planar targets, and spectra were recorded with a high-resolution grazing-incidence spectrograph. From the Doppler broadening of lines of Fe XX and Fe XXI, expansion velocities of about 830 km/s were determined. The relative time-averaged ion abundances of Fe XVIII, Fe XIX, Fe XX, and Fe XXI are estimated for three different spectra. The abundances do not differ by more than a factor of 4 for any of the spectra.

  3. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

    DOEpatents

    Kublak, G.D.; Richardson, M.C.

    1996-11-19

    Method and apparatus for producing extreme ultraviolet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10{sup 11}--10{sup 12} watts/cm{sup 2}) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10--30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle. 5 figs.

  4. Laboratory calibration of density-dependent lines in the extreme ultraviolet spectral region

    SciTech Connect

    Lepson, J. K.; Beiersdorfer, P.; Gu, M. F.; Desai, P.; Bitter, M.; Roquemore, L.; Reinke, M. L.

    2012-05-25

    We have been making spectral measurements in the extreme ultraviolet (EUV) from different laboratory sources in order to investigate the electron density dependence of various astrophysically important emission lines and to test the atomic models underlying the diagnostic line ratios. The measurement are being performed at the Livermore EBIT-I electron beam ion trap, the National Spherical Torus Experiment (NSTX) at Princeton, and the Alcator C-Mod tokamak at the Massachusetts Institute of Technology, which together span an electron density of four orders of magnitude and which allow us to test the various models at high and low density limits. Here we present measurements of Fe XXII and Ar XIV, which include new data from an ultra high resolution ({lambda}/{Delta}{lambda} >4000) spectrometer at the EBIT-I facility. We found good agreement between the measurements and modeling calculations for Fe XXII, but poorer agreement for Ar XIV.

  5. Liftoff lithography of metals for extreme ultraviolet lithography mask absorber layer patterning

    NASA Astrophysics Data System (ADS)

    Lyons, Adam; Teki, Ranganath; Hartley, John

    2012-03-01

    The authors present a process for patterning Extreme Ultraviolet Lithography (EUVL) mask absorber metal using electron beam evaporation and bi-layer liftoff lithography. The Line Edge Roughness (LER) and Critical Dimension Uniformity (CDU) of patterned chrome absorber are determined for various chrome thicknesses on silicon substrates, and the viability of the method for use with nickel absorber and on EUVL masks is demonstrated. Scanning Electron Microscope (SEM) data is used with SuMMIT software to determine the absorber LER and CDU. The Lawrence Berkeley National Labs Actinic Inspection Tool (AIT) is used to verify the printability of the pattern down to 24nm half pitch. The effect of processing on the integrity of the mask multilayer is measured using an actinic reflectometer at the College of Nanoscale Science and Engineering.

  6. Electron Beam Lithography Simulation for the Patterning of Extreme Ultraviolet Masks

    NASA Astrophysics Data System (ADS)

    Tsikrikas, N.; Patsis, G. P.; Raptis, I.; Gerardino, A.; Quesnel, E.

    2008-06-01

    Extreme ultraviolet lithography (EUVL) mask is a complex multilayer stack, fabricated with electron-beam lithography. Detailed understanding of the scattering events and energy loss mechanism of the electron beam within this stack is mandatory due to the high accuracy requirements of the fabrication process. Simulation of electron-beam lithography is performed incorporating the details of the mask material-stack and the metrological information of the final layout is quantified. The effect of the Mo-Si multilayer of the EUVL mask blank on the deposited energy in the resist film is investigated. Simulation of complex layout containing features of various sizes down to 100 nm reproduced experimental metrology trends on the fine features of the layout.

  7. Behavior of SiO{sub 2} nanostructures under intense extreme ultraviolet illumination

    SciTech Connect

    Heun, S.; Kremmer, S.; Ercolani, D.; Wurmbauer, H.; Teichert, C.

    2005-05-15

    The stability of conducting atomic force microscope (C-AFM)-induced surface modifications of thermally grown SiO{sub 2} under intense illumination in the extreme ultraviolet (EUV) is investigated with low-energy electron microscopy (LEEM) and x-ray photoemission electron microscopy (XPEEM). With LEEM we find that the protrusions are heavily charged after their formation, but this charge is annihilated after exposure of the sample to short pulses of EUV radiation. The spectra obtained from XPEEM reveal that the stripes formed by C-AFM consist of SiO{sub 2}. After extended EUV exposure, a radiation-induced desorption of the stripes as well as a desorption of the thermal oxide is observed.

  8. Note: Thermally stable thin-film filters for high-power extreme-ultraviolet applications.

    PubMed

    Tarrio, C; Berg, R F; Lucatorto, T B; Lairson, B; Lopez, H; Ayers, T

    2015-11-01

    We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7 W cm(-2), Ni-mesh-backed Zr filters have a typical lifetime of 20 h, at which point they suffer from pinholes and a 50% loss of transmission. Initial trials with Si filters on Ni meshes resulted in rupture of the filters in less than an hour. A simple thermal calculation showed that the temperature rise in those filters to be about 634 K. A similar calculation indicated that using a finer mesh with thicker wires and made of Cu reduces the temperature increase to about 60 K. We have exposed a Si filter backed by such a mesh for more than 60 h with little loss of transmission and no leaks. PMID:26628184

  9. Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle

    NASA Astrophysics Data System (ADS)

    Ko, Ki-Ho; Mo, Soo-Yeon; Kim, In-Seon; Oh, Hye-Keun

    2016-03-01

    The absorption of extreme-ultraviolet (EUV) pellicle could be the most critical problem because the EUV source power is still not good enough for achieving mass production. We found that the transmission loss due to the EUV pellicle could be compensated through proper optical proximity correction (OPC) of a pellicled mask. Patterning results of OPCed masks with different transmission pellicles are shown for various 1D and 2D patterns. From the results, it is clearly shown that we do not need to increase the dose to avoid the throughput loss even if a pellicle which has 80 % one-pass transmission is used. Therefore, the EUV pellicle manufacturing would be much easier because we can use much thicker film with higher absorption.

  10. Study of an astronomical extreme ultraviolet rocket spectrometer for use on shuttle missions

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1977-01-01

    The adaptation of an extreme ultraviolet astronomy rocket payload for flight on the shuttle was studied. A sample payload for determining integration and flight procedures for experiments which may typically be flown on shuttle missions was provided. The electrical, mechanical, thermal, and operational interface requirements between the payload and the orbiter were examined. Of particular concern was establishing a baseline payload accommodation which utilizes proven common hardware for electrical, data, command, and possibly real time monitoring functions. The instrument integration and checkout procedures necessary to assure satisfactory in-orbit instrument performance were defined and those procedures which can be implemented in such a way as to minimize their impact on orbiter integration schedules were identified.

  11. Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

    SciTech Connect

    Naulleau, Patrick; Anderson, Christopher N.; Chiu, Jerrin; Dean, Kim; Denham, Paul; George, Simi; Goldberg, Kenneth A.; Hoef, Brian; Jones, Gideon; Koh, Chawon; La Fontaine, Bruno; Ma, Andy; Montgomery, Warren; Niakoula, Dimitra; Park, Joo-On; Wallow, Tom; Wurm, Stefan

    2008-09-02

    Microfield exposure tools (METs) continue to play a dominant role in the development of extreme ultraviolet (EUV) resists. One of these tools is the 0.3 numerical aperture SEMATECH Berkeley MET operating as a resist and mask test center. Here they present an update on the tool summarizing some of the latest test and characterization results. they provide an update on the long-term aberration stability of the tool and present line-space imaging in chemically amplified photoresist down to the 20-nm half-pitch level. Although resist development has shown substantial progress in the area of resolution, line-edge-roughness (LER) remains a significant concern. Here we present a summary of recent LER performance results and consider the effect of mask contributors to the LER observed from the SEMATECH Berkeley microfield tool.

  12. Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source

    SciTech Connect

    Hara, Hiroyuki Arai, Goki; Dinh, Thanh-Hung; Higashiguchi, Takeshi; Jiang, Weihua; Miura, Taisuke; Endo, Akira; Ejima, Takeo; Li, Bowen; Dunne, Padraig; O'Sullivan, Gerry; Sunahara, Atsushi

    2015-11-21

    The extreme ultraviolet (EUV) emission and its spatial distribution as well as plasma parameters in a microplasma high-brightness light source are characterized by the use of a two-dimensional radiation hydrodynamic simulation. The expected EUV source size, which is determined by the expansion of the microplasma due to hydrodynamic motion, was evaluated to be 16 μm (full width) and was almost reproduced by the experimental result which showed an emission source diameter of 18–20 μm at a laser pulse duration of 150 ps [full width at half-maximum]. The numerical simulation suggests that high brightness EUV sources should be produced by use of a dot target based microplasma with a source diameter of about 20 μm.

  13. Fluorescence efficiency and visible re-emission spectrum of tetraphenyl butadiene films at extreme ultraviolet wavelengths

    NASA Astrophysics Data System (ADS)

    Gehman, V. M.; Seibert, S. R.; Rielage, K.; Hime, A.; Sun, Y.; Mei, D.-M.; Maassen, J.; Moore, D.

    2011-10-01

    A large number of current and future experiments in neutrino and dark matter detection use the scintillation light from noble elements as a mechanism for measuring energy deposition. The scintillation light from these elements is produced in the extreme ultraviolet (EUV) range, from 60 to 200 nm. Currently, the most practical technique for observing light at these wavelengths is to surround the scintillation volume with a thin film of tetraphenyl butadiene (TPB) to act as a fluor. The TPB film absorbs EUV photons and re-emits visible photons, detectable with a variety of commercial photosensors. Here we present a measurement of the re-emission spectrum of TPB films when illuminated with 128, 160, 175, and 250 nm light. We also measure the fluorescence efficiency as a function of incident wavelength from 120 to 250 nm.

  14. Three-dimensional nanoscale molecular imaging by extreme ultraviolet laser ablation mass spectrometry

    PubMed Central

    Kuznetsov, Ilya; Filevich, Jorge; Dong, Feng; Woolston, Mark; Chao, Weilun; Anderson, Erik H.; Bernstein, Elliot R.; Crick, Dean C.; Rocca, Jorge J.; Menoni, Carmen S.

    2015-01-01

    Analytical probes capable of mapping molecular composition at the nanoscale are of critical importance to materials research, biology and medicine. Mass spectral imaging makes it possible to visualize the spatial organization of multiple molecular components at a sample's surface. However, it is challenging for mass spectral imaging to map molecular composition in three dimensions (3D) with submicron resolution. Here we describe a mass spectral imaging method that exploits the high 3D localization of absorbed extreme ultraviolet laser light and its fundamentally distinct interaction with matter to determine molecular composition from a volume as small as 50 zl in a single laser shot. Molecular imaging with a lateral resolution of 75 nm and a depth resolution of 20 nm is demonstrated. These results open opportunities to visualize chemical composition and chemical changes in 3D at the nanoscale. PMID:25903827

  15. A solar extreme ultraviolet telescope and spectrograph for space shuttle. Volume 1: Investigation and technical plan

    NASA Technical Reports Server (NTRS)

    Neupert, W. M.

    1978-01-01

    A scientific investigation of heating and mass transport in the solar corona that is currently planned for a future Shuttle/Spacelab flight is outlined. The instrument to be used is a near-normal incidence grating spectrograph fed by a grazing incidence Wolter Type 2 telescope. A toroidal grating design provides stigmatic images of the corona up to 8 arc min in extent over the spectral region from 225 A to 370 A. Spatial resolution of at least 2 arc sec and spectral resolution of 0.050 A is achievable throughout the central 4 arc min field or view. Primary scientific data are recorded on Schumann-type film. An H-alpha slit jaw monitor and zero order extreme ultraviolet monitor are also planned to support instrument operation.

  16. Design of an Extreme Ultraviolet Spectrometer Suite for Isochoric-Heated Warm-Dense-Matter Studies

    NASA Astrophysics Data System (ADS)

    Ivancic, S.; Stillman, C. R.; Nilson, P. M.; Froula, D. H.

    2015-11-01

    An ultrafast streaked extreme ultraviolet (XUV) spectrometer (5 to 35 nm) is in development for the measurement of warm dense matter (WDM). In contrast to other forms of pyrometry where the temperature is inferred from bulk x-ray emission, XUV emission is restricted to the sample surface, allowing for the measurement of temperature at the material-vacuum interface. The measurement of the surface temperature is of particular importance in constraining models for the release of WDM. The divergence of surface and bulk temperature measurements may indicate gradients in temperature in the target. Coupling the XUV spectrometer to an ultrafast streak camera allows for the observation of picosecond time-scale evolution of the surface layer temperature. Two high-throughput XUV spectrometers are being designed to measure the time-resolved and absolute XUV emission. This material is based upon work supported by the Department of Energy National Nuclear Security Administration under Award Number DE-NA0001944.

  17. Reduction of image optics dependence of resist image performance for high NA extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Chun, Ouyang; Li, Yanqiu; Liu, Lihui

    2013-12-01

    High Numerical Aperture (NA) extreme ultraviolet lithography (EUVL) with different reduction is one option for 16 nm node and below. In our work, as NA increases to about 0.45, we discuss the impacts of reduction ratio of 5 or 6 on resist image performance such as Horizontal-Vertical (H-V) critical dimension (CD) bias for various incident angles and CD Uniformity induced by mask CD errors at wafer level. Commercial software PROLITH ™ and in-house program are adopted in simulation referred above. In conclusion, resist image performance can be improved with the increase of reduction ratio. H-V CD Bias with reduction ratio of 6 is obviously smaller than that with reduction ratio of 5 at maximum incident angle. Additionally, CD Uniformity (nm, 3 sigma) induced by mask CD errors for 5× optics system is larger, which means image quality is worse at 5× optics system.

  18. Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications.

    PubMed

    Windt, David L; Bellotti, Jeffrey A

    2009-09-10

    We report on the performance, structure and stability of periodic multilayer films containing silicon carbide (SiC) and aluminum (Al) layers designed for use as reflective coatings in the extreme ultraviolet (EUV). We find that SiC/Al multilayers prepared by magnetron sputtering have low stress, good temporal and thermal stability, and provide good performance in the EUV, particularly for applications requiring a narrow spectral bandpass, such as monochromatic solar imaging. Transmission electron microscopy reveals amorphous SiC layers and polycrystalline Al layers having a strong <111> texture, and relatively large roughness associated with the Al crystallites. Fits to EUV reflectance measurements also indicate large interface widths, consistent with the electron microscopy results. SiC/Al multilayers deposited by reactive sputtering with nitrogen comprise Al layers that are nearly amorphous and considerably smoother than films deposited nonreactively, but no improvements in EUV reflectance were obtained. PMID:19745857

  19. Design and performance of the telescope and detector covers on the Extreme Ultraviolet Explorer satellite

    NASA Technical Reports Server (NTRS)

    Tom, James L.

    1994-01-01

    Two cover mechanisms were designed and developed for the Extreme Ultraviolet Explorer (EUVE) science payload to keep the EUVE telescope mirrors and detectors sealed from the atmospheric environment until the spacecraft was placed into orbit. There were four telescope front covers and seven motorized detector covers on the EUVE science payload. The EUVE satellite was launched into orbit in June 1992 and all the covers operated successfully after launch. This success can be attributed to high design margins and extensive testing at each level of assembly. This paper described the design of the telescope front covers and the motorized detector covers. This paper also discusses some of the many design considerations and modifications made as performance and reliability problems became apparent from each phase of testing.

  20. Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) for control of biocompatibility

    NASA Astrophysics Data System (ADS)

    Ahad, Inam Ul; Butruk, Beata; Ayele, Mesfin; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk; Ciach, Tomasz; Brabazon, Dermot

    2015-12-01

    Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) was performed in order to enhance the degree of biocompatibility. Polymer samples were irradiated by different number of EUV shots using a laser-plasma based EUV source in the presence of nitrogen gas. The physical and chemical properties of EUV modified PTFE samples were studied using Atomic Force Microscopy, X-ray photoelectron spectroscopy and water contact angle (WCA) methods. Pronounced wall type micro and nano-structures appeared on the EUV treated polymer surfaces resulting in increased surface roughness and hydrophobicity. Stronger cell adhesion and good cell morphology were observed on EUV modified surfaces by in-vitro cell culture studies performed using L929 fibroblasts.

  1. Invisible marking system by extreme ultraviolet radiation: the new frontier for anti-counterfeiting tags

    NASA Astrophysics Data System (ADS)

    Di Lazzaro, P.; Bollanti, S.; Flora, F.; Mezi, L.; Murra, D.; Torre, A.; Bonfigli, F.; Montereali, R. M.; Vincenti, M. A.

    2016-07-01

    We present a marking technology which uses extreme ultraviolet radiation to write invisible patterns on tags based on alkali fluoride thin films. The shape of the pattern is pre-determined by a mask (in the case of contact lithography) or by a suitable mirror (projection lithography). Tags marked using this method offer a much better protection against fakes than currently available anti-counterfeiting techniques. The complexity and cost of this technology can be tailored to the value of the good to be protected, leaving, on the other hand, the specific reading technique straightforward. So far, we have exploited our invisible marking to tag artworks, identity cards, electrical components, and containers of radioactive wastes. Advantages and limits of this technology are discussed in comparison with the anti-counterfeiting systems available in the market.

  2. Carbon contamination of extreme ultraviolet (EUV) mask and its effect on imaging

    SciTech Connect

    Fan, Yu-Jen; Yankulin, Leonid; Antohe, Alin; Garg, Rashi; Thomas, Petros; Mbanaso, Chimaobi; Wuest, Andreas; Goodwin, Frank; Huh, Sungmin; Naulleau, Patrick; Goldlberg, Kenneth; Mochi, Iacopo; Denbeaux, Gregory

    2009-02-02

    Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging is a significant issue due to lowered throughput and potential effects on imaging performance. In this work, a series of carbon contamination experiments were performed on a patterned EUV mask. Contaminated features were then inspected with a reticle scanning electron microscope (SEM) and printed with the SEMA TECH Berkeley Microfield-Exposure tool (MET) [1]. In addition, the mask was analyzed using the SEMA TECH Berkeley Actinic-Inspection tool (AIT) [2] to determine the effect of carbon contamination on the absorbing features and printing performance. To understand the contamination topography, simulations were performed based on calculated aerial images and resist parameters. With the knowledge of the topography, simulations were then used to predict the effect of other thicknesses of the contamination layer, as well as the imaging performance on printed features.

  3. Hot electron generation by aluminum oligomers in plasmonic ultraviolet photodetectors.

    PubMed

    Ahmadivand, Arash; Sinha, Raju; Vabbina, Phani Kiran; Karabiyik, Mustafa; Kaya, Serkan; Pala, Nezih

    2016-06-13

    We report on an integrated plasmonic ultraviolet (UV) photodetector composed of aluminum Fano-resonant heptamer nanoantennas deposited on a Gallium Nitride (GaN) active layer which is grown on a sapphire substrate to generate significant photocurrent via formation of hot electrons by nanoclusters upon the decay of nonequilibrium plasmons. Using the plasmon hybridization theory and finite-difference time-domain (FDTD) method, it is shown that the generation of hot carriers by metallic clusters illuminated by UV beam leads to a large photocurrent. The induced Fano resonance (FR) minimum across the UV spectrum allows for noticeable enhancement in the absorption of optical power yielding a plasmonic UV photodetector with a high responsivity. It is also shown that varying the thickness of the oxide layer (Al2O3) around the nanodisks (tox) in a heptamer assembly adjusted the generated photocurrent and responsivity. The proposed plasmonic structure opens new horizons for designing and fabricating efficient opto-electronics devices with high gain and responsivity. PMID:27410381

  4. FIRST OBSERVATIONS OF A DOME-SHAPED LARGE-SCALE CORONAL EXTREME-ULTRAVIOLET WAVE

    SciTech Connect

    Veronig, A. M.; Muhr, N.; Kienreich, I. W.; Temmer, M.; Vrsnak, B.

    2010-06-10

    We present first observations of a dome-shaped large-scale extreme-ultraviolet coronal wave, recorded by the Extreme Ultraviolet Imager instrument on board STEREO-B on 2010 January 17. The main arguments that the observed structure is the wave dome (and not the coronal mass ejection, CME) are (1) the spherical form and sharpness of the dome's outer edge and the erupting CME loops observed inside the dome; (2) the low-coronal wave signatures above the limb perfectly connecting to the on-disk signatures of the wave; (3) the lateral extent of the expanding dome which is much larger than that of the coronal dimming; and (4) the associated high-frequency type II burst indicating shock formation low in the corona. The velocity of the upward expansion of the wave dome (v {approx} 650 km s{sup -1}) is larger than that of the lateral expansion of the wave (v {approx} 280 km s{sup -1}), indicating that the upward dome expansion is driven all the time, and thus depends on the CME speed, whereas in the lateral direction it is freely propagating after the CME lateral expansion stops. We also examine the evolution of the perturbation characteristics: first the perturbation profile steepens and the amplitude increases. Thereafter, the amplitude decreases with r {sup -2.5{+-}0.3}, the width broadens, and the integral below the perturbation remains constant. Our findings are consistent with the spherical expansion and decay of a weakly shocked fast-mode MHD wave.

  5. Serendipitous EUV sources detected during the first year of the Extreme Ultraviolet Explorer right angle program

    NASA Technical Reports Server (NTRS)

    Mcdonald, K.; Craig, N.; Sirk, M. M.; Drake, J. J.; Fruscione, A.; Vallerga, J. V.; Malina, R. F.

    1994-01-01

    We report the detection of 114 extreme ultraviolet (EUV; 58 - 740 A) sources, of which 99 are new serendipitous sources, based on observations made with the imaging telescopes on board the Extreme Ultraviolet Explorer (EUVE) during the Right Angle Program (RAP). These data were obtained using the survey scanners and the Deep Survey instrument during the first year of the spectroscopic guest observer phase of the mission, from January 1993 to January 1994. The data set consists of 162 discrete pointings whose exposure times are typically two orders of magnitude longer than the average exposure times during the EUVE all-sky survey. Based on these results, we can expect that EUVE will serendipitously detect approximately 100 new EUV sources per year, or about one new EUV source per 10 sq deg, during the guest observer phase of the EUVE mission. New EUVE sources of note include one B star and three extragalactic objects. The B star (HR 2875, EUVE J0729 - 38.7) is detected in both the Lexan/B (approximately 100 A) and Al/Ti/C (approximately 200 A) bandpasses, and the detection is shown not to be a result of UV leaks. We suggest that we are detecting EUV and/or soft x rays from a companion to the B star. Three sources, EUVE J2132+10.1, EUVE J2343-14.9, and EUVE J2359-30.6 are identified as the active galactic nuclei MKN 1513, MS2340.9-1511, and 1H2354-315, respectively.

  6. Extreme ultraviolet spectroscopy and photometry of VV Puppis during a high accretion state

    NASA Technical Reports Server (NTRS)

    Vennes, Stephane; Szkody, Paula; Sion, Edward M.; Long, Knox S.

    1995-01-01

    We determine the physical properties of the accretion region of the AM Her-type binary VV Puppis using extreme ultraviolet (EUV) medium-resolution spectroscopy and photometry obtained with the Extreme Ultraviolet Explorer (EUVE) observatory. The EUV continuum from VV Pup was detected in the wavelength range from 75 to 135 A and was simultaneously recorded with the Deep Survey/Spectrometer (DS/S) imaging telescope, allowing for the extraction of an accurate light curve. VV Pup appeared to have entered a high-accretion state just prior to the pointed EUVE observations. We use the EUV light curve to infer the diameter of the accretion region (d = 220 km) assuming a hemispherical geometry and a radius of 9000 km for the white dwarf. We perform a model atmosphere analysis and, based on the light curve properties and assuming a distance of 145 pc, we derive an effective temperature of the accretion region in the range 270,000 is less than T(sub eff) is less than 360,000 K and a neutral hydrogen column density in the local interstellar medium of n(sub H) = 1.9 - 3.7 x 10(exp 19)/sq cm. The total EUV/soft X-ray energy radiated by the accretion region is approximately 3.5 x 10(exp 32) ergs/s. Our results provide a first verification of past suggestions that deep heating of the white dwarf surface produces the soft X-ray flux from the polars. We present a possible detection of O VI absortion features, and we suggest that extensive EUVE observations targeting high-accretion events may result in oxygen and heavier element abundance determination in the accretion region.

  7. Serendipitous EUV sources detected during the first year of the Extreme Ultraviolet Explorer right angle program

    NASA Astrophysics Data System (ADS)

    McDonald, K.; Craig, N.; Sirk, M. M.; Drake, J. J.; Fruscione, A.; Vallerga, J. V.; Malina, R. F.

    1994-11-01

    We report the detection of 114 extreme ultraviolet (EUV; 58 - 740 A) sources, of which 99 are new serendipitous sources, based on observations made with the imaging telescopes on board the Extreme Ultraviolet Explorer (EUVE) during the Right Angle Program (RAP). These data were obtained using the survey scanners and the Deep Survey instrument during the first year of the spectroscopic guest observer phase of the mission, from January 1993 to January 1994. The data set consists of 162 discrete pointings whose exposure times are typically two orders of magnitude longer than the average exposure times during the EUVE all-sky survey. Based on these results, we can expect that EUVE will serendipitously detect approximately 100 new EUV sources per year, or about one new EUV source per 10 sq deg, during the guest observer phase of the EUVE mission. New EUVE sources of note include one B star and three extragalactic objects. The B star (HR 2875, EUVE J0729 - 38.7) is detected in both the Lexan/B (approximately 100 A) and Al/Ti/C (approximately 200 A) bandpasses, and the detection is shown not to be a result of UV leaks. We suggest that we are detecting EUV and/or soft x rays from a companion to the B star. Three sources, EUVE J2132+10.1, EUVE J2343-14.9, and EUVE J2359-30.6 are identified as the active galactic nuclei MKN 1513, MS2340.9-1511, and 1H2354-315, respectively.

  8. Earth-orbiting Extreme Ultraviolet Spectroscopic Mission SPRINT-A/EXCEED

    NASA Astrophysics Data System (ADS)

    Tsuchiya, Fuminori; Yoshikawa, I.; Yamazaki, A.; Yoshioka, K.; Uemizu, K.; Murakami, G.; Kimura, T.; Kagitani, M.; Terada, N.; Kasaba, Y.; Sakanoi, T.

    2012-10-01

    The EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) mission is an Earth-orbiting extreme ultraviolet (EUV) spectroscopic mission and the first in the SPRINT series of ISAS/JAXA. It will be launched in the summer of 2013. EUV spectroscopy is suitable for observing tenuous gases and plasmas around planets in the solar system. One of the primary targets is an inner magnetosphere of Jupiter, whose plasma dynamics is dominated by planetary rotation. In the EUV range, a number of emission lines originate from plasmas distributed in Jupiter’s inner magnetosphere. The spectrograph is designed to have a wavelength range of 55-145 nm with minimum spectral resolution of 0.4 nm, enabling the electron temperature and ion composition in the inner magnetosphere to be determined. Another objective is to investigate an unresolved problem concerning the escape of the atmosphere to space. EXCEED plans to make imaging observations of plasmas around Venus and Mars to determine the amounts of escaping atmosphere. The optics of the instrument consists of a primary mirror with a diameter of 20cm, a laminar type grating, and a 5-stage micro-channel plate assembly with a resistive anode encoder. The spectrograph slits have a FOV of 400 x 140 arc-seconds (maximum). To achieve high efficiencies, the surfaces of the primary mirror and the grating are coated with CVD-SiC. A feasibility study shows that EXCEED can determine plasma parameters in the Io plasma torus using an exposure time of 50 minutes. EXCEED also has another instruments, a target guide camera. It will be used to capture the target and guide the observation area to the slit with an accuracy of ±5 arc-seconds. With the help of the target guide camera, we will take spectral images with a long exposure time of 50 minutes and good spatial resolution of 20 arc-seconds.

  9. Active galaxies observed during the Extreme Ultraviolet Explorer all-sky survey

    NASA Technical Reports Server (NTRS)

    Marshall, H. L.; Fruscione, A.; Carone, T. E.

    1995-01-01

    We present observations of active galactic nuclei (AGNs) obtained with the Extreme Ultraviolet Explorer (EUVE) during the all-sky survey. A total of 13 sources were detected at a significance of 2.5 sigma or better: seven Seyfert galaxies, five BL Lac objects, and one quasar. The fraction of BL Lac objects is higher in our sample than in hard X-ray surveys but is consistent with the soft X-ray Einstein Slew Survey, indicating that the main reason for the large number of BL Lac objects in the extreme ulktraviolet (EUV) and soft X-ray bands is their steeper X-ray spectra. We show that the number of AGNs observed in both the EUVE and ROSAT Wide Field Camera surveys can readily be explained by modelling the EUV spectra with a simple power law in the case of BL Lac objects and with an additional EUV excess in the case of Seyferts and quasars. Allowing for cold matter absorption in Seyfert galaxy hosts drive up the inferred average continuum slope to 2.0 +/- 0.5 (at 90% confidence), compared to a slope of 1.0 usually found from soft X-ray data. If Seyfert galaxies without EUV excesses form a significant fraction of the population, then the average spectrum of those with bumps should be even steeper. We place a conservative limit on neutral gas in BL Lac objects: N(sub H) less than 10(exp 20)/sq cm.

  10. Co-Alignment System (CAS) study. Report on task 1-3. [Solar Extreme Ultraviolet Telescope and Spectrometer pointing system

    NASA Technical Reports Server (NTRS)

    Anderson, N. T.

    1980-01-01

    The design of a suitable coalignment system (CAS) for the Solar Extreme Ultraviolet Telescope and Spectrometer (SEUTS) is presented. The CAS provides offset adjustment capabilities to SEUTS which will be mounted on a single large pointing system with other devices. The suitability of existing designs is determined and modifications are suggested.

  11. Uncovering new thermal and mechanical behavior at the nanoscale using coherent extreme ultraviolet light

    NASA Astrophysics Data System (ADS)

    Hoogeboom-Pot, Kathleen Marie

    Tremendous recent progress in nanofabrication capabilities has made high-quality single-atomic layers and nanostructures with dimensions well below 50 nm commonplace, enabling unprecedented access to materials at the nanoscale. However, tools and techniques capable of characterizing the properties and function of nanosystems are still quite limited, leaving much of the fundamental physics that dominates material behavior in the deep nano-regime still unknown. Further understanding gained by studying nanoscale materials is critical both to fundamental science and to continued technological development. This thesis applies coherent extreme ultraviolet (EUV) light from tabletop high harmonic generation to study nanoscale systems on their intrinsic length and time scales (nanometers and femtoseconds, and above), specifically following thermal transport and acoustic dynamics. These studies have shown where and how nanostructured material properties can be quite different from their bulk counterparts. This has in turn allowed us to develop new theoretical descriptions to guide further work. By observing heat dissipation from the smallest nanostructure heat sources measured to date (at 20 nm in lateral size), this work uncovers a previously unobserved and unpredicted nanoscale thermal transport regime where both size and spacing of heat sources play a role in determining the heat dissipation effciency. Surprisingly, this shows that nanoscale heat sources can cool more quickly when spaced close together than when far apart. This discovery is significant to the engineering of thermal management in nanoscale systems and devices while also revealing new insight into the fundamental nature of thermal transport. Furthermore, we harness this new regime to demonstrate the first experimental measurement of the differential contributions of phonons with different mean free paths to thermal conductivity, down to mean free paths as short as 14 nm for the first time. The same

  12. Generation of extreme ultrasonics in rainforest katydids.

    PubMed

    Montealegre-Z, Fernando; Morris, Glenn K; Mason, Andrew C

    2006-12-01

    The calling song of an undescribed Meconematinae katydid (Tettigoniidae) from South America consists of trains of short, separated pure-tone sound pulses at 129 kHz (the highest calling note produced by an Arthropod). Paradoxically, these extremely high-frequency sound waves are produced by a low-velocity movement of the stridulatory forewings. Sound production during a wing stroke is pulsed, but the wings do not pause in their closing, requiring that the scraper, in its travel along the file, must do so to create the pulses. We hypothesize that during scraper pauses, the cuticle behind the scraper is bent by the ongoing relative displacement of the wings, storing deformation energy. When the scraper slips free it unbends while being carried along the file and its deformation energy contributes to a more powerful, higher-rate, one-tooth one-wave sound pulse, lasting no more than a few waves at 129 000 Hz. Some other katydid species make pure-tone ultrasonic pulses. Wing velocities and carriers among these pure-tone species fall into two groups: (1) species with ultrasonic carriers below 40 kHz that have higher calling frequencies correlated with higher wing-closing velocities and higher tooth densities: for these katydids the relationship between average tooth strike rate and song frequency approaches 1:1, as in cricket escapement mechanisms; (2) a group of species with ultrasonic carriers above 40 kHz (that includes the Meconematinae): for these katydids closing wing velocities are dramatically lower and they make short trains of pulses, with intervening periods of silence greater than the duration of the pulses they separate. This signal form may be the signature of scraper-stored elastic energy. PMID:17142681

  13. Extreme Mobility: Next Generation Tetrahedral Rovers

    NASA Astrophysics Data System (ADS)

    Clark, P. E.; Curtis, S. A.; Rilee, M. L.; Cheung, C. Y.; Wesenberg, R.; Brown, G.; Cooperrider, C.

    2007-01-01

    This paper describes the development and testing of a patented rover concept called Tetrahedral Explorer Technologies (TET), designed to provide extreme mobility and plug-and-play utility through reconfigurable addressable architecture. Here, we present the results of preliminary lab and field tests of Prototype III. Reconfigurable architecture is essential in exploration because reaching features of the great potential interest will require crossing a wide range of terrains largely inaccessible to permanently appendaged vehicles. One surface might be relatively flat and navigable, while another could be rough, variably sloping, broken, or dominated by unconsolidated debris. To be totally functional, structures must form pseudo-appendages varying in size, rate, and manner of deployment (gait) and moving at a speed approaching that of a human in rugged terrain. TET architecture is based on the tetrahedron, the basic space-filling shape, as building block. Tetrahedra are interconnected, their apices acting as nodes from which struts reversibly deploy. The tetrahedral framework acts as a simple skeletal muscular structure. Two simple robotic walker prototypes have already been developed from a single reconfigurable tetrahedron capable of tumbling. This paper presents the results of our attempts to simulate motions, improve the hardware, and develop gaits for a more evolved 12Tetrahedral Walker (Prototype 3) which high degrees of freedom locomotion commandable through a user friendly interface. Our rover is an early level mission concept, realized as an electromechanical system at present, which would allow autonomous in situ exploration of lunar sites when we return to the Moon. Such a rover could carry into inaccessible terrain an in situ analysis payload designed to provide not only details of composition of traversed terrain, but the identification of sites with resources useful for permanent bases, including water and high Ti glass.

  14. AlGaN-on-Si backside illuminated photodetectors for the extreme ultraviolet (EUV) range

    NASA Astrophysics Data System (ADS)

    Malinowski, P. E.; Duboz, J.-Y.; John, J.; Sturdevant, C.; Das, J.; Derluyn, J.; Germain, M.; de Moor, P.; Minoglou, K.; Semond, F.; Frayssinet, E.; Hochedez, J.-F.; Giordanengo, B.; van Hoof, C.; Mertens, R.

    2010-04-01

    We report on the fabrication and characterization of solar blind Metal-Semiconductor-Metal (MSM) based photodetectors for use in the extreme ultraviolet (EUV) wavelength range. The devices were fabricated in the AlGaN-on- Si material system, with Aluminum Gallium Nitride (AlGaN) epitaxial layers grown on Si(111) by means of Molecular Beam Epitaxy. The detectors' IV characteristics and photoresponse were measured between 200 and 400 nm. Spectral responsivity was calculated for comparison with the state-of-the-art ultraviolet photodetectors. It reaches the order of 0.1 A/W at the cut-off wavelength of 360 nm, for devices with Au fingers of 3 μm width and spacing of 3 μm. The rejection ratio of visible radiation (400 nm) was more than 3 orders of magnitude. In the additional post-processing step, the Si substrate was removed locally under the active area of the MSM photodetectors using SF6-based Reactive Ion Etching (RIE). In such scheme, the backside illumination is allowed and there is no shadowing of the active layer by the metal electrodes, which is advantageous for the EUV sensitivity. Completed devices were assembled and wire-bonded in customized TO-8 packages with an opening. The sensitivity at EUV was verified at the wavelengths of 30.4 and 58.4 nm using a He-based beamline. AlGaN photodetectors are a promising alternative for highly demanding applications such as space science or modern EUV lithography. The backside illumination approach is suited in particular for large, 2D focal plane arrays.

  15. The Limb-Imaging Ionospheric and Thermospheric Extreme-Ultraviolet Spectrograph (LITES) on the ISS

    NASA Astrophysics Data System (ADS)

    Stephan, Andrew W.; Finn, Susanna C.; Cook, Timothy A.; Chakrabarti, Supriya; Budzien, Scott A.

    2015-04-01

    The Limb-imaging Ionospheric and Thermospheric Extreme-ultraviolet Spectrograph (LITES) is being prepared for flight in early 2016 aboard the Space Test Program Houston 5 (STP-H5) experiment pallet to the International Space Station (ISS). LITES is an imaging spectrograph that spans 60-140 nm and will obtain limb profiles of the ionosphere, along with the key upper atmospheric constituents O and N2. During the day, LITES measures the OII 83.4 and 61.7 nm emissions that are produced by solar photoionization of atomic oxygen in the lower thermosphere. The 83.4 nm emission is resonantly scattered by ionospheric O+, and thus its altitude profile is formed by both the initial ionization brightness and the ionospheric content. The 61.7 nm emission is not scattered and is used to constrain the photoionization brightness in the retrieval. At night, recombination of O+ and electrons produces optically thin emissions at 91.1 and 135.6 nm that are used to tomographically reconstruct the two-dimensional ionosphere in the orbital plane.These observations will be complemented and validated by ground-based data from an international network of digisondes, visible spectrographs, and imagers, which will provide ground truth for the space-based measurements. Additionally, the STP-H5 mission includes the GPS Radio Occultation and Ultraviolet Photometer Co-located (GROUP-C) experiment that consists of a high-sensitivity, nadir-viewing photometer that measures the nighttime ionospheric airglow at 135.6 nm, and a GPS receiver that measures ionospheric electron content and scintillation. We will discuss the LITES measurements and science goals, and how LITES data will be combined with these other experiments to study low and middle latitude ionospheric structures on a global scale.

  16. Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) for application in science and technology

    NASA Astrophysics Data System (ADS)

    Bartnik, Andrzej; Wachulak, Przemysław; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Mirosław; Adjei, Daniel; Ahad, Inam Ul; Ayele, Mesfin G.; Fok, Tomasz; Szczurek, Anna; Torrisi, Alfio; Wegrzyński, Łukasz; Fiedorowicz, Henryk

    2015-05-01

    Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) developed in our laboratory for application in various areas of technology and science are presented. The sources are based on a laser-irradiated gas puff target approach. The targets formed by pulsed injection of gas under high-pressure are irradiated with nanosecond laser pulses from Nd:YAG lasers. We use commercial lasers generating pulses with time duration from 1ns to 10ns and energies from 0.5J to 10J at 10Hz repetition rate. The gas puff targets are produced using a double valve system equipped with a special nozzle to form a double-stream gas puff target which secures high conversion efficiency without degradation of the nozzle. The use of a gas puff target instead of a solid target makes generation of laser plasmas emitting soft x-rays and EUV possible without target debris production. The sources are equipped with various optical systems, including grazing incidence axisymmetric ellipsoidal mirrors, a "lobster eye" type grazing incidence multi-foil mirror, and an ellipsoidal mirror with Mo/Si multilayer coating, to collect soft x-ray and EUV radiation and form the radiation beams. In this paper new applications of these sources in various fields, including soft x-ray and EUV imaging in nanoscale, EUV radiography and tomography, EUV materials processing and modification of polymer surfaces, EUV photoionization of gases, radiobiology and soft x-ray contact microscopy are reviewed.

  17. Instrumentation for analysis and utilization of extreme-ultraviolet and soft x-ray high-order harmonics

    SciTech Connect

    Poletto, L.; Bonora, S.; Pascolini, M.; Villoresi, P.

    2004-11-01

    The design and the performances of an extreme ultraviolet (EUV)spectrometer/monochromator for generation and diagnostics of high-order harmonics of an ultrashort (<30 fs) pulsed laser focused onto a gas jet are presented. The harmonic generation is optimized using an adaptive mirror before the laser focusing stage. A toroidal mirror is used to focus the XUV radiation in an intermediate stage for pump/probe experiments. A grazing-incidence flat-field spectrometer for the 5-75 nm spectral region has been designed: it adopts a stigmatic toroidal mirror and a varied line-space flat grating mounted in converging light. The almost flat stigmatic spectrum is acquired by a 40-mm-diameter microchannel plate intensifier; the whole detector can be moved to scan various portions of the spectrum. Different detectors allow one to acquire both integrated and single shot spectra at 1 kHz repetition rate. The absolute calibration of the spectrometer is provided. The same optical scheme can be applied to the design of a constant deviation angle EUV monochromator by substituting the detector block with an exit slit.

  18. Extreme ultraviolet spectroscopy of low-Z ion plasmas for fusion applications

    SciTech Connect

    Wilcox, P. G.; Safronova, A. S.; Kantsyrev, V. L.; Safronova, U. I.; Williamson, K. M.; Yilmaz, M. F.; Clementson, J.; Beiersdorfer, P.; Struve, K. W.

    2008-10-15

    The study of impurities is a key component of magnetic fusion research as it is directly related to plasma properties and steady-state operation. Two of the most important low-Z impurities are carbon and oxygen. The appropriate method of diagnosing these ions in plasmas is extreme ultraviolet (EUV) spectroscopy. In this work the results of two different sets of experiments are considered, and the spectra in a spectral region from 40 to 300 A are analyzed. The first set of experiments was carried out at the Sustained Spheromak Physics Experiment at LLNL, where EUV spectra of oxygen ions were recorded. The second set of experiments was performed at the compact laser-plasma x-ray/EUV facility 'Sparky' at UNR. In particular, Mylar and Teflon slabs were used as targets to produce carbon, oxygen, and fluorine ions of different ionization stages. Nonlocal thermodynamic equilibrium kinetic models of O, F, and C were applied to identify the most diagnostically important spectral features of low-Z ions between 40 to 300 A and to provide plasma parameters for both sets of experiments.

  19. Investigation and prediction of image placement errors in extreme ultraviolet lithography masks

    NASA Astrophysics Data System (ADS)

    Zheng, Liang

    2010-11-01

    According to the latest ITRS Roadmap, extreme ultraviolet lithography (EUVL) is expected to be one of the principal carriers for the IC production at sub-45 nm technology nodes. One of the most challenging tasks to fulfill EUVL is the fabrication of the EUVL mask in which the most important issue is the control of image placement errors. In this paper, the EUVL mask fabrication process was analyzed and image placement errors due to the fabrication process were investigated and predicted. A theoretical analysis was conducted to analytically benchmark the EUVL mask fabrication process. A line-and-space pattern (with pattern coverage of 50%) was employed in the theoretical analysis as an example. The theoretical deduction revealed that this 50% coverage pattern produces the same global response as a uniformly stressed thin film with half of the stress-thickness product of the patterned lines. Finite element (FE) models were established to simulate the EUVL mask fabrication process. In FE simulations, a new equivalent modeling technique was developed to predict the global distortions of the mask and the local distortions of the pattern features. Results indicate that for the EUVL mask with this line-and-space pattern (50% pattern coverage), the maximum image placement error is only about 10 nm, which is largely due to the application of a flat electrostatic chuck in both e-beam mounting and exposure chucking. Nonuniformities of either the mask or the electrostatic chuck will add to the final image placement errors of the EUVL mask.

  20. Energy transport in short-pulse-laser-heated targets measured using extreme ultraviolet laser backlighting.

    PubMed

    Wilson, L A; Tallents, G J; Pasley, J; Whittaker, D S; Rose, S J; Guilbaud, O; Cassou, K; Kazamias, S; Daboussi, S; Pittman, M; Delmas, O; Demailly, J; Neveu, O; Ros, D

    2012-08-01

    The accurate characterization of thermal electron transport and the determination of heating by suprathermal electrons in laser driven solid targets are both issues of great importance to the current experiments being performed at the National Ignition Facility, which aims to achieve thermonuclear fusion ignition using lasers. Ionization, induced by electronic heat conduction, can cause the opacity of a material to drop significantly once bound-free photoionization is no longer energetically possible. We show that this drop in opacity enables measurements of the transmission of extreme ultraviolet (EUV) laser pulses at 13.9 nm to act as a signature of the heating of thin (50 nm) iron layers with a 50-nm thick parylene-N (CH) overlay irradiated by 35-fs pulses at irradiance 3×10(16) Wcm(-2). Comparing EUV transmission measurements at different times after irradiation to fluid code simulations shows that the target is instantaneously heated by hot electrons (with approximately 10% of the laser energy), followed by thermal conduction with a flux limiter of ≈0.05. PMID:23005868

  1. Effects of an axial magnetic field on Z-pinch plasmas for extreme ultraviolet sources

    SciTech Connect

    Katsuki, Sunao; Kimura, Akihiro; Kondo, Yoshihiro; Horita, Hiroyuki; Namihira, Takao; Sakugawa, Takashi; Akiyama, Hidenori

    2006-01-01

    This paper describes the effect of an axial magnetic field (B{sub z}) on plasma pinch dynamics and on the extreme ultraviolet (EUV) emission property of a compact Z-pinch device for EUV sources. The Z-pinch xenon plasma was driven by a pulse current with an amplitude of 27 kA and duration of 150 ns in an alumina tube with a diameter of 5 mm. A quasistatic magnetic field of up to 360 G is applied to the plasma. The EUV emission was evaluated for spectra, spatial distribution of the emission, and light energy at 13.5 nm with 2% bandwidth. A time-resolved interferogram provides the electron line density and pinch dynamics of the plasma. When a magnetic field of 160 G was applied to the plasma, the emission energy was approximately double that without the magnetic field. The spectroscopic measurement shows that the EUV spectrum drastically varies with magnetic-field strength. The time-resolved interferogram indicates that the axial magnetic field contributes by making the plasma compression smooth and by sustaining certain plasma conditions longer. From these experimental results, it was concluded that applying an axial magnetic field can be an effective method to improve EUV emission.

  2. Low thermal expansion material (LTEM) cleaning and optimization for extreme ultraviolet (EUV) blank deposition

    NASA Astrophysics Data System (ADS)

    Kadaksham, Arun J.; Teki, Ranganath; Godwin, Milton; House, Matt; Goodwin, Frank

    2013-04-01

    With the insertion of extreme ultraviolet lithography (EUVL) for high volume manufacturing (HVM) expected in the next few years, it is necessary to examine the performance of low thermal expansion materials (LTEMs) and assess industry readiness of EUV substrates. Owing to the high cost of LTEM, most of the development work so far has been done on fused silica substrates. Especially in developing cleaning technology prior to multilayer deposition, fused silica substrates have been used extensively, and defect trends and champion blank data have been reported using multilayer deposition data on fused silica substrates. In this paper, the response of LTEMs to cleaning processes prior to multilayer deposition is discussed. Cleaning processes discussed in this paper are developed using fused silica substrates and applied on LTEM substrates. The defectivity and properties of LTEM to fused silica are compared. Using the dense scan feature of the substrate inspection tool capable of detecting defects down to 35 nm SiO2 equivalent size and appropriate defect decoration techniques to decorate small defects on substrates to make them detectable, cleaning technologies that have the potential to meet high demands on LTEM for EUVL are developed and optimized.

  3. Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

    NASA Astrophysics Data System (ADS)

    Del Re, Ryan; Passarelli, James; Sortland, Miriam; Cardineau, Brian; Ekinci, Yasin; Buitrago, Elizabeth; Neisser, Mark; Freedman, Daniel A.; Brainard, Robert L.

    2015-10-01

    Pure thin films of organotin compounds have been lithographically evaluated using extreme ultraviolet lithography (EUVL, 13.5 nm). Twenty compounds of the type R2Sn) were spin-coated from solutions in toluene, exposed to EUV light, and developed in organic solvents. Exposures produced negative-tone contrast curves and dense-line patterns using interference lithography. Contrast-curve studies indicated that the photosensitivity is linearly related to the molecular weight of the carboxylate group bound to tin. Additionally, photosensitivity was found to be linearly related to free radical stability of the hydrocarbon group bound directly to tin (R=phenyl, butyl, and benzyl). Dense-line patterning capabilities varied, but two resists in particular show exceptionally good line edge roughness (LER). A resist composed of an amorphous film of )SnCC)2 (1) achieved 1.4 nm LER at 22-nm half-pitch patterning and a resist composed of )Sn) (2) achieved 1.1 nm LER at 35-nm half-pitch at high exposure doses (600 mJ/cm2). Two photoresists that use olefin-based carboxylates, )SnCCH (3) and )SnCC (4), demonstrated better photospeeds (5 mJ/cm2 and 27 mJ/cm2) but worse LER.

  4. Opto-mechanisms design of extreme-ultraviolet camera onboard Chang E lunar lander.

    PubMed

    Li, Zhaohui; Chen, Bo; Song, Kefei; Wang, Xiaodong; Liu, Shijie; Yang, Liang; Hu, Qinglong; Qiao, Ke; Zhang, Liping; Wu, Guodong; Yu, Ping

    2014-06-30

    The extreme-ultraviolet camera mounted on the Lander of China Chang-E lunar exploration project launched in 2013 is the first instrument used to imaging from the lunar surface to the whole plasmasphere around the earth. Taking into account both the lunar environment conditions and the weight and volume constraints, a single spherical mirror and a spherical microchannel plate detector make up the compact optical system. An optimized opto-mechanical design was presented using Finite Element Analysis Model, and the detail design for the important assemblies of the 2-axis platform, the primary mirror, the aperture door mechanism and MCP detector were all specially addressed for their environmental adaptability and reliability. Tests of mechanical characteristics have demonstrated that the position and pointing accuracy and its stability meets the operation requirements of 2'. Vibration results have shown that the EUVC has adequate stiffness and strength safety margin to survive in launch and the moon environments. The imaging performance with the resolution of 0.08° is measured after vibration, in agreement with the predicted performance. PMID:24977848

  5. Modeling of radiative properties of Sn plasmas for extreme-ultraviolet source

    NASA Astrophysics Data System (ADS)

    Sasaki, Akira; Sunahara, Atsushi; Furukawa, Hiroyuki; Nishihara, Katsunobu; Fujioka, Shinsuke; Nishikawa, Takeshi; Koike, Fumihiro; Ohashi, Hayato; Tanuma, Hajime

    2010-06-01

    Atomic processes in Sn plasmas are investigated for application to extreme-ultraviolet (EUV) light sources used in microlithography. We develop a full collisional radiative (CR) model of Sn plasmas based on calculated atomic data using Hebrew University Lawrence Livermore Atomic Code (HULLAC). Resonance and satellite lines from singly and multiply excited states of Sn ions, which contribute significantly to the EUV emission, are identified and included in the model through a systematic investigation of their effect on the emission spectra. The wavelengths of the 4d-4f+4p-4d transitions of Sn5+ to Sn13+ are investigated, because of their importance for determining the conversion efficiency of the EUV source, in conjunction with the effect of configuration interaction in the calculation of atomic structure. Calculated emission spectra are compared with those of charge exchange spectroscopy and of laser produced plasma EUV sources. The comparison is also carried out for the opacity of a radiatively heated Sn sample. A reasonable agreement is obtained between calculated and experimental EUV emission spectra observed under the typical condition of EUV sources with the ion density and ionization temperature of the plasma around 1018 cm-3 and 20 eV, respectively, by applying a wavelength correction to the resonance and satellite lines. Finally, the spectral emissivity and opacity of Sn plasmas are calculated as a function of electron temperature and ion density. The results are useful for radiation hydrodynamics simulations for the optimization of EUV sources.

  6. Properties of the extreme ultraviolet emission from germanium and gallium plasmas

    NASA Astrophysics Data System (ADS)

    Li, Bowen; Hara, Hiroyuki; Suzuki, Yuhei; Arai, Goki; Higashiguchi, Takeshi; Ohashi, Hayato; Jiang, Weihua; Makimura, Tetsuya; Sakaue, Hiroyuki A.; Suzuki, Chihiro; Kato, Daiji; Murakami, Izumi; Dunne, Padraig; Long, Elaine; Sheridan, Paul; Chen, Ximeng; O'Sullivan, Gerry

    2015-08-01

    We report on the usefulness of germanium (Ge) and gallium (Ga) plasmas as potential extreme ultraviolet (EUV) sources at both 6.x and 13.5 nm, wavelengths of interest for lithography and metrology applications. Spectra from plasmas produced using neodymium-doped yttrium-aluminum-garnet (Nd:YAG) lasers with pulse durations of 170 ps and 7 ns [full width at half-maximum] and a compact electron beam ion trap have been used to determine the charge states responsible while theoretical calculations using atomic structure Cowan and HULLAC codes enabled the identification of structure in the Ge spectrum arising from strong transitions of the type 3d - 4p and 3d - 4f. Transitions of the type 3d - 4f in Ge10+ and Ga11+ were found to lie in the 6.x nm region, while 3 p -3 d transitions from a range of stages in both elements contribute in the 13.5 nm region. We also studied the emission spectra of galinstan plasmas, and the results imply that galinstan might provide a promising candidate for EUV applications that exploit the progress in the development of multilayer mirrors for operation at 6.x nm.

  7. Temperature and Extreme-ultraviolet Intensity in a Coronal Prominence Cavity and Streamer

    NASA Astrophysics Data System (ADS)

    Kucera, T. A.; Gibson, S. E.; Schmit, D. J.; Landi, E.; Tripathi, D.

    2012-09-01

    We analyze the temperature and EUV line emission of a coronal cavity and surrounding streamer in terms of a morphological forward model. We use a series of iron line ratios observed with the Hinode Extreme-ultraviolet Imaging Spectrograph (EIS) on 2007 August 9 to constrain temperature as a function of altitude in a morphological forward model of the streamer and cavity. We also compare model predictions to the EIS EUV line intensities and polarized brightness (pB) data from the Mauna Loa Solar Observatory (MLSO) Mark 4 K-coronameter. This work builds on earlier analysis using the same model to determine geometry of and density in the same cavity and streamer. The fit to the data with altitude-dependent temperature profiles indicates that both the streamer and cavity have temperatures in the range 1.4-1.7 MK. However, the cavity exhibits substantial substructure such that the altitude-dependent temperature profile is not sufficient to completely model conditions in the cavity. Coronal prominence cavities are structured by magnetism so clues to this structure are to be found in their plasma properties. These temperature substructures are likely related to structures in the cavity magnetic field. Furthermore, we find that the model overestimates the EUV line intensities by a factor of 4-10, without overestimating pB. We discuss this difference in terms of filling factors and uncertainties in density diagnostics and elemental abundances.

  8. Photoionized argon plasmas induced with intense soft x-ray and extreme ultraviolet pulses

    NASA Astrophysics Data System (ADS)

    Bartnik, A.; Wachulak, P.; Fok, T.; Węgrzyński, Ł.; Fiedorowicz, H.; Skrzeczanowski, W.; Pisarczyk, T.; Chodukowski, T.; Kalinowska, Z.; Dudzak, R.; Dostal, J.; Krousky, E.; Skala, J.; Ullschmied, J.; Hrebicek, J.; Medrik, T.

    2016-01-01

    In this work, photoionized plasmas were created by irradiation of gaseous argon with soft x-ray (SXR) and extreme ultraviolet (EUV) intense radiation pulses. Two different laser-produced plasma sources, employing a low energy Nd:YAG laser and a high energy iodine laser system (PALS), were used for creation of photoionized plasmas. In both cases the EUV or SXR beam irradiated the Ar stream, injected into a vacuum chamber synchronously with the radiation pulse. Emission spectra, measured for the Ar photoionized plasmas indicated strong differences in ionization degree for plasmas produced using low and high energy systems. In case of the the EUV driving pulses, emission lines corresponding to neutral atoms and singly charged ions were observed. In case of the SXR pulses utilized for the photoionized plasma creation, only Ar V–VIII emission lines were recorded. Additionally, electron density measurements were performed by laser interferometry employing a femtosecond laser system synchronized with the irradiating system. Maximum electron density for the Ar photoionized plasma, induced using the high energy system, reached 1.9 · 1018 cm‑3. Interferometric measurements performed for the moment of maximum intensity of the main laser pulse (t  =  0) revealed no fringe shift. Detection limit for the interferometric measurements was estimated. It allowed to estimate the upper limit for electron density at t  =  0 as 5 · 1016 cm‑3.

  9. Spectral sharpening algorithm for a polychromatic reflectometer in the extreme ultraviolet.

    PubMed

    Banyay, M; Juschkin, L

    2010-04-01

    In this paper we present a practical approach to the analysis of spectra recorded from a table-top reflectometer operating in the extreme ultraviolet (UV) spectral range. Such in-lab tools, which utilize light from plasma based sources, are currently under investigation for a broad range of applications such as surface and thin-film analysis, near-edge X-ray absorption fine structure (NEXAFS) studies, or reflectivity measurements. In a polychromatic approach one is able to record surface-sensitive reflectometric spectra that are characteristic for each material or thin-film-layer stack. By monitoring the incident and emergent spectrum before and after the sample using two independent detectors, one can deduce its reflectivity. However, the analysis of the raw data, in terms of digitized spectrometric intensity values, can be difficult due to the nature of the quasi-continuous emission from such plasma sources, particularly with xenon, which is a good broad-band radiator in the 10-20 nm spectral range. The complexity of configurations involved in transitions of highly ionized xenon makes a line-by-line analysis very difficult as the real spectrum consists of thousands of unresolved transitions superimposed by distinctive lines. Additionally, sampling issues, detector geometry, and minor setup misalignments can distort the result. We propose a practical algorithm for spectral decomposition and sharpening of such data. Measurement results are presented that confirm the functionality of the algorithm. PMID:20412625

  10. Thermal conduction properties of Mo/Si multilayers for extreme ultraviolet optics

    NASA Astrophysics Data System (ADS)

    Bozorg-Grayeli, Elah; Li, Zijian; Asheghi, Mehdi; Delgado, Gil; Pokrovsky, Alexander; Panzer, Matthew; Wack, Daniel; Goodson, Kenneth E.

    2012-10-01

    Extreme ultraviolet (EUV) lithography requires nanostructured optical components, whose reliability can be influenced by radiation absorption and thermal conduction. Thermal conduction analysis is complicated by sub-continuum electron and phonon transport and the lack of thermal property data. This paper measures and interprets thermal property data, and their evolution due to heating exposure, for Mo/Si EUV mirrors with 6.9 nm period and Mo/Si thickness ratios of 0.4/0.6 and 0.6/0.4. We use time-domain thermoreflectance and the 3ω method to estimate the thermal resistance between the Ru capping layer and the Mo/Si multilayers (RRu-Mo/Si = 1.5 m2 K GW-1), as well as the out-of-plane thermal conductivity (kMo/Si 1.1 W m-1 K-1) and thermal anisotropy (η = 13). This work also reports the impact of annealing on thermal conduction in a co-deposited MoSi2 layer, increasing the thermal conductivity from 1.7 W m-1 K-1 in the amorphous phase to 2.8 W m-1 K-1 in the crystalline phase.

  11. THE EXTREME ULTRAVIOLET DEFICIT AND MAGNETICALLY ARRESTED ACCRETION IN RADIO-LOUD QUASARS

    SciTech Connect

    Punsly, Brian

    2014-12-20

    The Hubble Space Telescope composite quasar spectra presented in Telfer et al. show a significant deficit of emission in the extreme ultraviolet for the radio-loud component of the quasar population (RLQs) compared to the radio-quiet component of the quasar population. The composite quasar continuum emission between 1100 Å and ∼580 Å is generally considered to be associated with the innermost regions of the accretion flow onto the central black hole. The deficit between 1100 Å and 580 Å in RLQs has a straightforward interpretation as a missing or a suppressed innermost region of local energy dissipation in the accretion flow. It is proposed that this can be the result of islands of large-scale magnetic flux in RLQs that are located close to the central black hole that remove energy from the accretion flow as Poynting flux (sometimes called magnetically arrested accretion). These magnetic islands are natural sites for launching relativistic jets. Based on the Telfer et al. data and the numerical simulations of accretion flows in Penna et al., the magnetic islands are concentrated between the event horizon and an outer boundary of <2.8 M (in geometrized units) for rapidly rotating black holes and <5.5 M for modestly rotating black holes.

  12. Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks

    NASA Astrophysics Data System (ADS)

    Wood, Obert; Wong, Keith; Parks, Valentin; Kearney, Patrick; Meyer-Ilse, Julia; Luong, Vu; Philipsen, Vicky; Faheem, Mohammad; Liang, Yifan; Kumar, Ajay; Chen, Esther; Bennett, Corbin; Fu, Bianzhu; Gribelyuk, Michael; Zhao, Wayne; Mangat, Pawitter; Van der Heide, Paul

    2016-03-01

    Extreme ultraviolet (EUV) lithography with reflective photomasks continues to be a potential patterning technology for high volume manufacturing at the 7 nm technology node and beyond. EUV photomasks with alternative materials to the commonly used Mo/Si multilayer (ML) reflector and patterned Ta-based absorber (both of which are known to require shadow effect corrections and lead to large through-focus pattern placement errors) are being actively explored. Because the reflective bandwidth of a Ru/Si ML is significantly wider than the reflective bandwidth of a Mo/Si ML and the effective reflectance plane in Ru/Si is closer to the ML surface, Ru/Si ML coatings may be viable alternatives to the Mo/Si ML coatings that are commercially available today because they will lead to smaller mask 3D effects. In this paper, increases in the peak reflectivity and the reflective bandwidth of Ru/Si ML reflectors by using B4C interlayers to improve the Ru-Si interfaces are discussed. The conclusions of this paper are supported with the results of both experimental measurements and rigorous simulations.

  13. Time dependent changes in extreme ultraviolet reflectivity of Ru mirrors from electron-induced surface chemistry

    NASA Astrophysics Data System (ADS)

    Kanjilal, A.; Catalfano, M.; Harilal, S. S.; Hassanein, A.; Rice, B.

    2012-03-01

    Time dependent changes in 13.5 nm extreme ultraviolet (EUV) reflectivity of Ru mirrors due to variations in surface composition were investigated. The surface properties of Ru films were analyzed in situ by means of X-ray photoelectron spectroscopy (XPS), and further verified by Auger electron spectroscopy (AES). Moreover, the impact on EUV reflectivity (EUVR) with time was examined in situ via continuous and/or discrete EUV exposures. The rapid decrease in EUVR was observed in the presence of photoelectrons (PEs) from Ru mirror of the EUV setup, whereas no significant variation was recorded by screening out additional PEs. Detailed XPS and AES analyses suggest that carbon deposition via dissociation of residual hydrocarbons plays a dominant role in the presence of additional PEs, and thus reduces the reflectivity rapidly. Using EUV photoelectron spectroscopy, systematic reduction of the secondary electron yield from the Ru mirror surface was observed in consecutive scans, and therefore supports the formation of carbonaceous Ru surface in the presence of additional PEs.

  14. Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

    SciTech Connect

    Roy, Amitava E-mail: aroy@barc.gov.in; Murtaza Hassan, Syed; Harilal, Sivanandan S.; Hassanein, Ahmed; Endo, Akira; Mocek, Tomas

    2014-05-15

    We investigated the role of a guiding magnetic field on extreme ultraviolet (EUV) and ion emission from a laser produced Sn plasma for various laser pulse duration and intensity. For producing plasmas, planar slabs of pure Sn were irradiated with 1064 nm, Nd:YAG laser pulses with varying pulse duration (5–15 ns) and intensity. A magnetic trap was fabricated with the use of two neodymium permanent magnets which provided a magnetic field strength ∼0.5 T along the plume expansion direction. Our results indicate that the EUV conversion efficiency do not depend significantly on applied axial magnetic field. Faraday Cup ion analysis of Sn plasma show that the ion flux reduces by a factor of ∼5 with the application of an axial magnetic field. It was found that the plasma plume expand in the lateral direction with peak velocity measured to be ∼1.2 cm/μs and reduced to ∼0.75 cm/μs with the application of an axial magnetic field. The plume expansion features recorded using fast photography in the presence and absence of 0.5 T axial magnetic field are simulated using particle-in-cell code. Our simulation results qualitatively predict the plasma behavior.

  15. Spectroscopy in the extreme ultraviolet on an electron beam ion trap

    SciTech Connect

    Beiersdorfer, P.; Lopez-Urrutia, J.R.; Springer, P.; Utter, S.B.; Wong, K.L.

    1999-01-01

    A compact grazing-incidence spectrometer was implemented on the Livermore electron beam ion trap facility for spectral measurements in the extreme ultraviolet spectral region. The spectrometer employed a 1200 scr(l)/mm grating designed for flat-field focusing and a charge coupled device camera for readout. The instrument was used to measure line emission in the range from 25 to 220 {Angstrom} with a resolving power as high as 600. The performance and calibration of the instrument is described and spectra from highly charged nitrogen and iron ions are presented. Measurements of the {ital K}-shell spectrum of He-like N{sup 5+} are presented that confirm earlier wavelength determinations and illustrate the accuracy achievable with the instrument. Our measurement suggests a change in the line identifications of the forbidden He-like N{sup 5+} transition 1s2sthinsp{sup 3}S{sub 1}{r_arrow}1s{sup 2}thinsp{sup 1}S{sub 0} and of the Li-like N{sup 4+} collisional satellite transition 1s2s2pthinsp{sup 2}P{sub 3/2}{r_arrow}1s{sup 2}2sthinsp{sup 2}S{sub 1/2} observed on the Alcator C-Mod tokamak. {copyright} {ital 1999 American Institute of Physics.}

  16. Control of coherent excitation of neon in the extreme ultraviolet regime.

    PubMed

    Plenge, Jürgen; Wirsing, Andreas; Raschpichler, Christopher; Wassermann, Bernhard; Rühl, Eckart

    2011-01-01

    Coherent excitation of a superposition of Rydberg states in neon by the 13th harmonic of an intense 804 nm pulse and the formation of a wave packet is reported. Pump-probe experiments are performed, where the 3d-manifold of the 2p6-->2p5 (2P3/2) 3d [1/2]1- and 2p6-->2p5 (2P3/2) 3d [3/2]1-transitions are excited by an extreme ultraviolet (XUV) radiation pulse, which is centered at 20.05 eV photon energy. The temporal evolution of the excited state population is probed by ionization with a time-delayed 804 nm pulse. Control of coherent transient excitation and wave packet dynamics in the XUV-regime is demonstrated, where the spectral phase of the 13th harmonic is used as a control parameter. Modulation of the phase is achieved by propagation of the XUV-pulse through neon of variable gas density. The experimental results indicate that phase-shaped high-order harmonics can be used to control fundamental coherent excitation processes in the XUV-regime. PMID:22452090

  17. Thermalization of electrons in decaying extreme ultraviolet photons induced low pressure argon plasma

    NASA Astrophysics Data System (ADS)

    Beckers, J.; van der Horst, R. M.; Osorio, E. A.; Kroesen, G. M. W.; Banine, V. Y.

    2016-06-01

    We monitored—in the pressure range: 0.5–15 Pa—the electron temperature in decaying plasmas induced in argon gas by pulsed irradiation with extreme ultraviolet (EUV) photons with wavelengths closely around 13.5 nm. For this purpose, temporal measurements of the space-averaged and electric field weighted electron density after pulsed EUV irradiation are combined with an ambipolar diffusion model of the plasma. Results demonstrate that electrons are thermalized to room temperature before the plasma has fully expanded to the chamber walls for pressures of 3 Pa and higher. At pressures below 3 Pa, the electron temperature was found to be up to 0.1 eV above room temperature which is explained by the fact that plasma expansion is too quick for the electrons to fully thermalize. The comparison between plasma expansion duration towards a surface, plasma decay at a surface and time needed for thermalization and cooling of electrons is essential for designers of EUV lithography tools and EUV sources since the temperature of electrons dictates many fundamental physical processes.

  18. Structural Characterization and Lifetime Stability of Mo/Y Extreme Ultraviolet Multilayer Mirrors

    SciTech Connect

    Kjornrattanawanich, B; Bajt, S

    2004-05-20

    We observe a dramatic dependence of the extreme ultraviolet (EUV) reflectivity of Mo/Y multilayers on the oxygen content of yttrium. This is explained by a change in microstructure, increase in roughness of the Y layers and not by an increase in absorption due to oxygen in Y layers. We find best reflectivity of 38.4% is achieved with an oxygen content of 25%, which reduces to 32.6% and 29.6% for multilayers manufactured from oxygen free yttrium and 39%-oxygen yttrium, respectively. These results highlight the importance of experimentally determined optical constants as well as interface roughness in multilayer calculations. In addition, lifetime stability of Mo/Y multilayers with different capping layers was monitored for one year. The molybdenum- and palladium-capped samples exhibited low surface roughness and about 4% relative reflectivity loss in one year. The relative reflectivity loss on yttrium-capped sample (yttrium with 39% oxygen) was about 8%. However, the reflectivity loss in all three capping layers occurred within the first 100 days after the deposition and the reflectivity remained stable afterwards.

  19. Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

    NASA Astrophysics Data System (ADS)

    Upadhyaya, Mihir; Jindal, Vibhu; Basavalingappa, Adarsh; Herbol, Henry; Harris-Jones, Jenah; Jang, Il-Yong; Goldberg, Kenneth A.; Mochi, Iacopo; Marokkey, Sajan; Demmerle, Wolfgang; Pistor, Thomas V.; Denbeaux, Gregory

    2015-04-01

    Since completely defect-free masks will be hard to achieve, it is essential to have a good understanding of the printability of the native extreme ultraviolet (EUV) mask defects. In this work, we performed a systematic study of native mask defects to understand the defect printability they cause. The multilayer growth over native substrate mask blank defects was correlated to the multilayer growth over regular-shaped defects having similar profiles in terms of their width and height. To model the multilayer growth over the defects, a multilayer growth model based on a level-set technique was used that took into account the tool deposition conditions of the Veeco Nexus ion beam deposition tool. Further, the printability of the characterized native defects was studied at the SEMATECH-Berkeley Actinic Inspection Tool (AIT), an EUV mask-imaging microscope at Lawrence Berkeley National Laboratory. Printability of the modeled regular-shaped defects, which were propagated up the multilayer stack using level-set growth model, was studied using defect printability simulations implementing the waveguide algorithm. Good comparison was observed between AIT and the simulation results, thus demonstrating that multilayer growth over a defect is primarily a function of a defect's width and height, irrespective of its shape.

  20. DIET Processes on Ruthenium Surfaces Related to Extreme Ultraviolet Lithography (EUVL)

    SciTech Connect

    Yakshinskiy, B.; Wasielewski, R; Loginova, E; Hedhili, M; Madey, T

    2008-01-01

    The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions (high vacuum, and 13.5 nm (92 eV) photons). Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H{sub 2}O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is 6 x 10{sup -19} cm{sup 2}. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is 0.02 electrons/photon at 92 eV.

  1. Medium-resolution studies of extreme-ultraviolet emission from CO by electron impact

    NASA Technical Reports Server (NTRS)

    Kanik, Isik; James, Geoffrey K.; Ajello, Joseph M.

    1995-01-01

    We report medium-resolution (0.025 nm full width at half maximum (FWHM)) electron impact-induced emission spectra of CO for 20, 100, and 200 eV impact energies. The emission spectra correspond to the extreme ultraviolet transitions from the B (sup 1)Sigma(sup +)(0), and E (sup 1)Pi(0) vibronic states to the X (sup 1)Sigma(sup +)(0) ground state. The present measurements are carried out at 20 times higher spectral resolution (to separate the many blended components) compared to our previous measurements, which were at a spectral resolution of 0.5 nm FWHM. The emission cross sections corresponding to the B (sup 1)Sigma(sup +)(0) yields X (sup 1)Sigma(sup +)(0), C (sup 1)Sigma(sup +)(0) yields X (sup 1)Sigma(sup +)(0), and E (sup 1)Pi(0) yields X (sup 1)Sigma(sup +)(0) resonance transitions were measured. In addition, excitation functions (0-1 keV) extending well into the Born region have been measured for the strong transitions (B (sup 1)Sigma(sup +)(0) yields X (sup 1)Sigma(sup +)(0) and C (sup 1)Sigma(sup +)(0)) and oscillator strengths have been determined, using a modified Born approximation analytic fit to the measured excitation function.

  2. Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources

    NASA Astrophysics Data System (ADS)

    Danylyuk, Serhiy; Loosen, Peter; Bergmann, Klaus; Kim, Hyun-su; Juschkin, Larissa

    2013-07-01

    Lithography has been faced with a challenge to bring resolution down to the 10-nm level. One of the promising approaches for such ultra-high-resolution printing is self-imaging Talbot lithography with extreme ultraviolet (EUV) radiation. However, as the size of structures on the mask approaches the wavelength of the radiation, diffraction influence needs to be evaluated precisely to estimate the achievable resolution and quality of the patterns. Here, the results of finite-difference time-domain simulations of the diffraction on EUV transmission masks in dependence to the period (pitch) of the mask are presented with the aim to determine the resolution that can be realistically achieved with the EUV Talbot lithography. The modeled experimental setup is utilizing partially coherent EUV radiation with the wavelength of 10.9 nm from Xe/Ar discharge plasma EUV source and Ni/Nb-based amplitude transmission mask. The results demonstrate that the method can be used to produce patterns with resolution down to 7.5-nm half-pitch with 2∶1 mask demagnification utilizing achromatic Talbot effect and transverse electric (TE)-polarized light.

  3. The Extreme Ultraviolet Contributions to the Solar Irradiance Reference Spectrum (SIRS)

    NASA Astrophysics Data System (ADS)

    Chamberlin, P. C.; Woods, T. N.; Harder, J. W.; Hock, R. A.; Snow, M.

    2008-12-01

    The Whole Heliosphere Interval (WHI) was a coordinated effort with inputs from over 50 models and observatories, both satellite and ground based, to characterize the Sun and heliosphere during solar minimum conditions. The time period selected for this quiet Sun WHI campaign was April 10-16, 2008. One of the goals of the solar minimum WHI was to produce a definitive Solar Irradiance Reference Spectrum (SIRS) for quiet Sun conditions ranging in wavelength from 0.1 nm up to 2400 nm. During this WHI campaign on April 14, 2008, a sounding rocket was launched from White Sands Missile Range that observed the solar spectral irradiance in these solar minimum conditions in the extreme ultraviolet (EUV) wavelength range from 0.1-106 nm as well as the bright hydrogen Lyman alpha emission at 121.6 nm. The rocket observations from 6.0-106.0 nm and at 0.1 nm spectral resolution are the EUV input for the SIRS. These rocket EUV measurements are discussed following a brief introduction to the entire SIRS spectrum developed for the WHI campaign.

  4. Diagnosis of energy transport in iron buried layer targets using an extreme ultraviolet laser

    SciTech Connect

    Shahzad, M.; Culfa, O.; Rossall, A. K.; Tallents, G. J.; Wilson, L. A.; Guilbaud, O.; Kazamias, S.; Delmas, O.; Demailly, J.; Maitrallain, A.; Pittman, M.; Baynard, E.; Farjardo, M.

    2015-02-15

    We demonstrate the use of extreme ultra-violet (EUV) laboratory lasers in probing energy transport in laser irradiated solid targets. EUV transmission through targets containing a thin layer of iron (50 nm) encased in plastic (CH) after irradiation by a short pulse (35 fs) laser focussed to irradiances 3 × 10{sup 16} Wcm{sup −2} is measured. Heating of the iron layer gives rise to a rapid decrease in EUV opacity and an increase in the transmission of the 13.9 nm laser radiation as the iron ionizes to Fe{sup 5+} and above where the ion ionisation energy is greater than the EUV probe photon energy (89 eV). A one dimensional hydrodynamic fluid code HYADES has been used to simulate the temporal variation in EUV transmission (wavelength 13.9 nm) using IMP opacity values for the iron layer and the simulated transmissions are compared to measured transmission values. When a deliberate pre-pulse is used to preform an expanding plastic plasma, it is found that radiation is important in the heating of the iron layer while for pre-pulse free irradiation, radiation transport is not significant.

  5. Calibration of the San Marco airglow-solar spectrometer instrument in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Worden, John; Woods, Thomas N.; Rottman, Gary J.; Schmidtke, Gerhard; Tai, Hongsheng; Doll, Harry G.; Solomon, Stanley C.

    1996-02-01

    The San Marco 5 carried the airglow-solar spectrometer instrument (ASSI). This 18-channel spectrometer measured the solar and terrestrial radiation in the wavelength region between 20 and 700 nm for 9 months in 1988. The ASSI extreme ultraviolet (EUV) channels showed significant sensitivity changes during the mission. The sensitivity changes of the EUV channels are quantified by comparing ASSI solar EUV irradiance measurements to the solar EUV irradiance derived from a solar proxy model. A sensitivity change model is developed that shows that exponential curves can adequately describe the sensitivity changes of the ASSI optics and detectors. The November 10 calibration parameters and the sensitivity change model can be used to derive the EUV terrestrial airglow brightness for the time period of the ASSI mission. Analysis of the solar Lyman-(alpha) irradiance measured by the ASSI, the solar mesospheric explorer (SME), and the upper atmosphere research satellite has led to a revised Lyman-(alpha) irradiance for the San Marco mission. For example, the ASSI November 10, 1988, Lyman-(alpha) measurement is 5.3 X 1011 photons cm-2 s-1 versus the reported SME measurement of 3.35 X 1011 photons cm-2 s-1.

  6. Infrared-laser-assisted photoionization of helium by coherent extreme ultraviolet light

    SciTech Connect

    Tong Xiaomin; Toshima, Nobuyuki

    2010-04-15

    We investigate the infrared (IR)-laser-assisted photoionization of He by a coherent extreme ultraviolet (euv) light solving the time-dependent Schroedinger equation. A combined field of the 13th and 15th harmonics created from the same IR laser source is used to ionize He atoms coherently. We show that the ionization probabilities oscillate as a function of the time delay between the IR and the euv pulses. On the other hand, the oscillation amplitude increases as the IR intensity increases, reaches a maximum when the IR intensity is around 6x10{sup 12} W/cm{sup 2}, and then decreases as the IR intensity increases further. Decomposing the ionization probabilities by the 13th and 15th harmonics, we illustrate that the oscillation amplitude is small for a lower IR laser intensity due to the fact that the transition strength by the 13th harmonic is much smaller than the one by the 15th harmonic. When the IR intensity increases further above 6x10{sup 12} W/cm{sup 2}, the transition strength by the 13th harmonic becomes larger than the one by the 15th harmonic and the oscillation amplitude is reduced again. By tuning the relative field strengths of the 13th and 15th harmonics or the IR intensity, we can control the oscillation amplitude.

  7. Phase defect mitigation strategy: fiducial mark requirements on extreme ultraviolet lithography mask

    NASA Astrophysics Data System (ADS)

    Murachi, Tetsunori; Amano, Tsuyoshi; Oh, Sung Hyun

    2012-03-01

    For Extreme Ultra-Violet Lithography (EUVL), fabrication of defect free multi-layered (ML) mask blanks is one of the difficult challenges. ML defects come from substrate defects and adders during ML coating, cannot be removed, and are called as phase defect. If we can accept ML blanks with certain number of phase defects, the blank yield will be drastically up. In order to use such blanks, the phase defects need to be identified and located during ML blank defect inspection before absorber patterning. To locate phase defects on the blanks accurately and precisely, Fiducial Marks (FM) on ML blanks are needed for mask alignment and defect location information. The proposed requirement of defect location accuracy is <=20 nm [1]. In this paper, we will present the result of feasibility study on the requirements of FM on EUVL mask by simulations & experiments to establish the phase defect mitigation method with EUV Actinic Blank Inspection (ABI) tool. And the optimum ranges of FM line width, depth, and fabrication method on EUVL mask based on above results are >= 5 um line width, >= 100 nm depth FM etched into ML respectively, and additional finer FMs for magnified optics.

  8. HIGH-RESOLUTION SPECTROSCOPY OF FEIGE 24 IN THE EXTREME-ULTRAVIOLET

    SciTech Connect

    Kowalski, M. P.; Wood, K. S.; Yentis, D. J.; Berendse, F. B.; Cruddace, R. G.; Barstow, M. A.; Lapington, J. S.; Fritz, G. G.; Barbee, T. W. Jr E-mail: kent.wood@nrl.navy.mil E-mail: raymond.cruddace@nrl.navy.mil E-mail: jsl12@star.le.ac.uk E-mail: barbee2@llnl.gov

    2011-04-01

    We report the first high-resolution (R = 4000) spectroscopic observation of the binary DA white dwarf Feige 24 in the extreme-ultraviolet band 220-250 A. A stellar atmosphere model assuming a homogeneous element distribution yields a best fit to the data that excludes a significant abundance of photospheric helium. The upper limit on the photospheric helium abundance is 2.5 x 10{sup -6} (90% confidence), equivalent to a lower limit of 1.2 x 10{sup -13} M{sub sun} on the overlying layer of hydrogen. An ionized interstellar He component (3.9 x 10{sup 17} cm{sup -2}) is clearly present along the line of sight, which implies an He ionization fraction of 0.72, considerably higher than is typical of the local interstellar medium. However, some of this material may be associated with circumstellar gas, which has been detected by analysis of the C IV absorption line doublet in a Hubble Space Telescope/Space Telescope Imaging Spectrograph spectrum.

  9. Three-dimensional numerical simulation of MHD waves observed by the Extreme Ultraviolet Imaging Telescope

    NASA Astrophysics Data System (ADS)

    Wu, S. T.; Zheng, Huinan; Wang, S.; Thompson, B. J.; Plunkett, S. P.; Zhao, X. P.; Dryer, M.

    2001-11-01

    We investigate the global large amplitude waves propagating across the solar disk as observed by the SOHO/Extreme Ultraviolet Imaging Telescope (EIT). These waves appear to be similar to those observed in Hα in the chromosphere and which are known as ``Moreton waves,'' associated with large solar flares [Moreton, 1960, 1964]. Uchida [1968] interpreted these Moreton waves as the propagation of a hydromagnetics disturbance in the corona with its wavefront intersecting the chromosphere to produce the Moreton wave as observed in movie sequences of Hα images. To search for an understanding of the physical characteristics of these newly observed EIT waves, we constructed a three-dimensional, time-dependent, numerical magnetohydrodynamic (MHD) model. Measured global magnetic fields, obtained from the Wilcox Solar Observatory (WSO) at Stanford University, are used as the initial magnetic field to investigate hydromagnetics wave propagation in a three-dimensional spherical geometry. Using magnetohydrodynamic wave theory together with simulation, we are able to identify these observed EIT waves as fast mode MHD waves dominated by the acoustic mode, called magnetosonic waves. The results to be presented include the following: (1) comparison of observed and simulated morphology projected on the disk and the distance-time curves on the solar disk; (2) three-dimensional evolution of the disturbed magnetic field lines at various viewing angles; (3) evolution of the plasma density profile at a specific location as a function of latitude; and (4) computed Friedrich's diagrams to identify the MHD wave characteristics.

  10. Electron impact excitation collision strengths for extreme ultraviolet lines of Fe VII

    SciTech Connect

    Tayal, S. S.; Zatsarinny, O. E-mail: oleg.zatsarinny@drake.edu

    2014-06-10

    Extensive calculations have been performed for electron impact excitation collision strengths and oscillator strengths for the Fe VII extreme ultraviolet lines of astrophysical importance. The collision strengths for fine-structure transitions are calculated in the B-spline Breit-Pauli R-matrix approach. The target wavefunctions have been calculated in the multiconfiguration Hartree-Fock method with term-dependent non-orthogonal orbitals. The close-coupling expansion includes 189 fine-structure levels of Fe VII belonging to terms of the ground 3p {sup 6}3d {sup 2} and excited 3p {sup 5}3d {sup 3}, 3p {sup 6}3d4l, 3p {sup 6}3d5s, and 3p {sup 6}3d5p configurations. The effective collision strengths are determined from the electron excitation collision strengths by integration over a Maxwellian distribution of electron velocities. The effective collision strengths are provided for 17766 fine-structure transitions at electron temperatures from 10{sup 4} to 10{sup 7} K. Our results normally agree with the previous R-matrix frame-transformation calculations by Witthoeft and Badnell. However, there are important differences for some transitions with the previous calculations. The corrections to the previous results are mainly due to more extensive expansions for the Fe VII target states.

  11. Extreme ultraviolet imaging of three-dimensional magnetic reconnection in a solar eruption.

    PubMed

    Sun, J Q; Cheng, X; Ding, M D; Guo, Y; Priest, E R; Parnell, C E; Edwards, S J; Zhang, J; Chen, P F; Fang, C

    2015-01-01

    Magnetic reconnection, a change of magnetic field connectivity, is a fundamental physical process in which magnetic energy is released explosively, and it is responsible for various eruptive phenomena in the universe. However, this process is difficult to observe directly. Here, the magnetic topology associated with a solar reconnection event is studied in three dimensions using the combined perspectives of two spacecraft. The sequence of extreme ultraviolet images clearly shows that two groups of oppositely directed and non-coplanar magnetic loops gradually approach each other, forming a separator or quasi-separator and then reconnecting. The plasma near the reconnection site is subsequently heated from ∼1 to ≥5 MK. Shortly afterwards, warm flare loops (∼3 MK) appear underneath the hot plasma. Other observational signatures of reconnection, including plasma inflows and downflows, are unambiguously revealed and quantitatively measured. These observations provide direct evidence of magnetic reconnection in a three-dimensional configuration and reveal its origin. PMID:26113464

  12. TEMPERATURE AND EXTREME-ULTRAVIOLET INTENSITY IN A CORONAL PROMINENCE CAVITY AND STREAMER

    SciTech Connect

    Kucera, T. A.; Tripathi, D.

    2012-09-20

    We analyze the temperature and EUV line emission of a coronal cavity and surrounding streamer in terms of a morphological forward model. We use a series of iron line ratios observed with the Hinode Extreme-ultraviolet Imaging Spectrograph (EIS) on 2007 August 9 to constrain temperature as a function of altitude in a morphological forward model of the streamer and cavity. We also compare model predictions to the EIS EUV line intensities and polarized brightness (pB) data from the Mauna Loa Solar Observatory (MLSO) Mark 4 K-coronameter. This work builds on earlier analysis using the same model to determine geometry of and density in the same cavity and streamer. The fit to the data with altitude-dependent temperature profiles indicates that both the streamer and cavity have temperatures in the range 1.4-1.7 MK. However, the cavity exhibits substantial substructure such that the altitude-dependent temperature profile is not sufficient to completely model conditions in the cavity. Coronal prominence cavities are structured by magnetism so clues to this structure are to be found in their plasma properties. These temperature substructures are likely related to structures in the cavity magnetic field. Furthermore, we find that the model overestimates the EUV line intensities by a factor of 4-10, without overestimating pB. We discuss this difference in terms of filling factors and uncertainties in density diagnostics and elemental abundances.

  13. Simulation of particle velocity in a laser-produced tin plasma extreme ultraviolet source

    SciTech Connect

    Masnavi, Majid; Nakajima, Mitsuo; Horioka, Kazuhiko; Araghy, Homaira Parchamy; Endo, Akira

    2011-06-15

    In connection with fast heating in a laser produced plasma (LPP) extreme ultraviolet (EUV) source, the superheating behavior of bulk tin (Sn) at high heating rates is investigated. A constant temperature and pressure molecular dynamics simulation using modified Lennard-Jones and Coulomb potentials suitable for studying the liquid structure of Sn is employed in order to derive the caloric curves of the solid and liquid phases. The results have shown transient effects on the phase transitions. Superheating is observed during the melting and vaporizing processes. The velocity distribution of Sn particles against typical laser fluence in a LPP EUV light source has been numerically investigated using a simplified method including a one-dimensional, two-temperature, molecular dynamics, and steady-state ionization model. In the framework of our model, it was found that ejected Sn particles have a maximum velocity on the order of 10 to 40 km/s in plasma created using a nanosecond pre-pulse neodymium-doped yttrium aluminum garnet (Nd:YAG, 1.06 {mu}m) laser in EUV lithography experiments.

  14. Re-Entry Survivability Risk Assessment of the Extreme Ultraviolet Explorer (EUVE)

    NASA Technical Reports Server (NTRS)

    O'Hara, Robin E.; Johnson, Nicholas L.

    2001-01-01

    A reentry analysis of the Extreme Ultraviolet Explorer (EUVE) spacecraft was performed using the Object Reentry Survival Analysis Tool (ORSAT) - Version 5.0. The analysis was done in response to a request by NASA Headquarters and Goddard Space Flight Center (GSFC) after a preliminary assessment using the NASA Johnson Space Center Debris Assessment Software (DAS) - Version 1.0 had shown that the EUVE reentry may produce a debris area greater than the limit set within the NASA Safety Standard 1740.14 guidelines. DAS predicted that an uncontrolled reentry of the EUVE spacecraft would result in a total casualty area of 12.41 sq m, which exceeds the 8 sq m limit set in the NASA standards and implies a potential human casualty risk of approximately 1 in 5300. The ORSAT model enabled a higher fidelity thermal analysis of the EUVE spacecraft, utilizing sophisticated material and thermal properties such as emissivity, heat of oxidation, thermal conductivity, and material thickness inputs, which provided a foundation for a more in depth analysis of the reentering objects. Due to the conservative nature of the DAS study, it was reasonable to run ORSAT for only the ten objects shown to survive in the original DAS analysis. The result of the ORSAT study was a reduced casualty area of only 5.95 sq m, well within NASA safety limits. With the risk to human life now acceptably low, NASA can avoid having to take mitigation measures and allow EUVE to reenter the Earth's atmosphere uncontrolled.

  15. The composition and structure of white dwarf atmospheres revealed by extreme ultraviolet spectroscopy

    NASA Technical Reports Server (NTRS)

    Barstow, Martin A.; Hubeny, Ivan; Lanz, Thierry; Holberg, Jay B.; Sion, Edward M.

    1995-01-01

    The ROentgen SATellite (ROSAT) and Extreme UltraViolet Explorer (EUVE) all-sky surveys have resulted in an important change in our understanding of the general composition of hydrogen-rich DA white dwarf atmospheres, with the photospheric opacity dominated by heavy elements rather than helium in the hottest stars (T > 40, 000 K). Most stars cooler than 40,000 K have more or less pure H atmospheres. However, one question, which has not been resolved, concerned the specific nature of the heavy elements and the role of helium in the hottest white dwarfs. One view of white dwarf evolution requires that H-rich DA stars form by gravitational settling of He from either DAO or He-rich central stars of planetary nebulae. In this case, the youngest (hottest) DA white dwarfs may still contain visible traces of He. Spectroscopic observations now available with EUVE provide a crucial test of these ideas. Analysis of data from the EUVE Guest Observer programme and EUVE public archive allows quantitative consideration of the sources of EUV opacity and places limits on the abundance of He which may be present.

  16. An extreme ultraviolet spectrometer experiment for the Shuttle Get Away Special Program

    NASA Technical Reports Server (NTRS)

    Conway, R. R.; Mccoy, R. P.; Meier, R. R.; Mount, G. H.; Prinz, D. K.; Young, J. M.; Carruthers, G. R.

    1984-01-01

    An extreme ultraviolet (EUV) spectrometer experiment operated successfully during the STS-7 mission in an experiment to measure the global and diurnal variation of the EUV airglow. The spectrometer is an F 3.5 Wadsworth mount with mechanical collimator, a 75 x 75 mm grating, and a bare microchannel plate detector providing a spectral resolution of 7 X FWHM. Read-out of the signal is through discrete channels or resistive anode techniques. The experiment includes a microcomputer, 20 Mbit tape recorder, and a 28V, 40 Ahr silver-zinc battery. It is the first GAS payload to use an opening door. The spectrometer's 0.1 x 4.2 deg field of view is pointed vertically out of the shuttle bay. During the STS-7 flight data were acquired continuously for a period of 5 hours and 37 minutes, providing spectra of the 570 A to 850 A wavelength region of the airglow. Five diurnal cycles of the 584 A emission of neutral helium and the 834 A emission of ionized atomic oxygen were recorded. The experiment also recorded ion events and pressure pulses associated with thruster firings. The experiment is to fly again on Mission 41-F.

  17. Extreme ultraviolet detection using AlGaN-on-Si inverted Schottky photodiodes

    SciTech Connect

    Malinowski, Pawel E.; Mertens, Robert; Van Hoof, Chris; Duboz, Jean-Yves; Semond, Fabrice; Frayssinet, Eric; Verhoeve, Peter; Giordanengo, Boris; BenMoussa, Ali

    2011-04-04

    We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky diodes for extreme ultraviolet (EUV) detection. AlGaN layers were grown on silicon wafers by molecular beam epitaxy with the conventional and inverted Schottky structure, where the undoped, active layer was grown before or after the n-doped layer, respectively. Different current mechanisms were observed in the two structures. The inverted Schottky diode was designed for the optimized backside sensitivity in the hybrid imagers. A cut-off wavelength of 280 nm was observed with three orders of magnitude intrinsic rejection ratio of the visible radiation. Furthermore, the inverted structure was characterized using a EUV source based on helium discharge and an open electrode design was used to improve the sensitivity. The characteristic He I and He II emission lines were observed at the wavelengths of 58.4 nm and 30.4 nm, respectively, proving the feasibility of using the inverted layer stack for EUV detection.

  18. Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography

    SciTech Connect

    Kubiak, G.D.; Tichenor, D.A.; Ray-Chaudhuri, A.K.

    1994-08-01

    The performance of a new 10x-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve 0.1 {mu}m resolution over a 0.4 mm image field of view, an increase in area of a factor of 100 over previous designs. An off-set aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. The system is illuminated using extreme ultraviolet (EUV) radiation emitted from a laser plasma source and collected by an ellipsoidal condenser. A 450 turning mirror is used to relay the collected EUV radiation onto a near-normal reflecting mask. Multiple sets of primary and secondary elements were fabricated, matched and clocked to minimize the effects of small figure errors on imaging performance. Optical metrology indicates that the wave-front error within the subaperture used is within a factor of two of the design value. Images recorded in PMMA and ZEP 520 resists reveal good imaging fidelity over much of the 0.4 mm field with equal line/space gratings being resolved to 0.1 {mu}m.

  19. Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography

    SciTech Connect

    Kubiak, G.D.; Tichenor, D.A.; Ray-Chaudhuri, A.K.; Malinowski, M.E.; Stulen, R.H.; Haney, S.J.; Berger, K.W.; Nissen, R.P.; Wilkerson, G.A.; Paul, P.H. ); Bjorkholm, J.E.; Fetter, L.A.; Freeman, R.R.; Himel, M.D.; MacDowell, A.A.; Tennant, D.M.; Wood, O.R. II ); Waskiewicz, W.K.; White, D.L.; Windt, D.L. ); Jewell, T.E. )

    1994-11-01

    The performance of a new 10[times]-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve 0.1 [mu]m resolution over a 0.4 mm image field of view, an increase in area of a factor of 100 over previous designs. An offset aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. The system is illuminated using extreme ultraviolet (EUV) radiation emitted from a laser plasma source and collected by an ellipsoidal condenser. A 45[degree] turning mirror is used to relay the collected EUV radiation onto a near-normal reflecting mask. Multiple sets of primary and secondary elements were fabricated, matched, and clocked to minimize the effects of small figure errors on imaging performance. Optical metrology indicates that the wave-front error within the subaperture used is within a factor of 2 of the design value. Images recorded in poly(methyl methacrylate) and ZEP 520 (Nippon Zeon) resists reveal good imaging fidelity over much of the 0.4 mm field with equal line/space gratings being resolved to 0.1 [mu]m.

  20. Quasar Absorption Lines in the Extreme Ultraviolet: The Smoking Guns of Cosmic Feedback

    NASA Astrophysics Data System (ADS)

    Tripp, Todd

    2011-01-01

    Three years ago at the winter AAS meeting I presented a talk entitled, perhaps somewhat pretentiously, "Terra Incognita: Probing The IGM-Galaxy Interface With COS." Now that the Cosmic Origins Spectrograph (COS) has been successfully installed on the Hubble Space Telescope, this instrument is delivering data that even exceed my hopes and predictions from three years ago. This talk will demonstrate that COS is enabling investigations of aspects of the Universe that have never been seen before. Specific examples will include the following: (1) Detections of absorption lines of Ne VIII and Mg X, which probe highly-ionized and low-density plasmas that can exist at temperatures in excess of 106 K. Due to the low density of galaxy halos and the IGM, X-ray emission from these plasmas is entirely undetectable with current or future missions. (2) Detections of remarkably strong O VI absorbers spanning velocity ranges in excess of hundreds of km/s, probably arising in galactic winds. While such outflows can be seen from the ground, the extreme ultraviolet provides a much richer suite of physical conditions diagnostics. (3) Detection of molecular hydrogen in unexpected places. An unifying thems of these examples is cosmic feedback and accretion -- these observations provide important new constraints on how galaxies interact with their surroundings.

  1. Deprotection blue in extreme ultraviolet photoresists: influence of base loading and post-exposure bake temperture

    SciTech Connect

    Anderson, Christopher N.; Naulleau, Patrick P.

    2008-06-02

    The deprotection blur of Rohm and Haas XP 5435, XP 5271, and XP5496 extreme ultraviolet photoresists has been determined as their base weight percent is varied. They have also determined the deprotection blur of TOK EUVR P1123 photoresist as the post-exposure bake temperature is varied from 80 C to 120 C. In Rohm and Haas XP 5435 and XP5271 resists 7x and 3x (respective) increases in base weight percent reduce the size of successfully patterned 1:1 line-space features by 16 nm and 8 nm with corresponding reductions in deprotection blur of 7 nm and 4 nm. In XP 5496 a 7x increase in base weight percent reduces the size of successfully patterned 1:1 line-space features from 48 nm to 38 nm without changing deprotection blur. In TOK EUVR P1123 resist, a reduction in post-exposure bake temperature from 100 C to 80 C reduces deprotection blur from 21 nm to 10 nm and reduces patterned LER from 4.8 nm to 4.1 nm.

  2. Mitigation of ion and particulate emission from laser-produced plasmas used for extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Di Lazzaro, Paolo; Bollanti, Sarah; Flora, Francesco; Mezi, Luca; Murra, Daniele; Torre, Amalia

    2013-05-01

    While developing a laboratory-scale micro-exposure tool for extreme ultraviolet (EUV) projection lithography which uses a laser-produced plasma emitting EUV pulsed radiation, we faced the problem of suppressing the various debris (ions, neutrals, particulate, clusters, droplets) emitted by the plasma target. The suppression of debris is a crucial task in the frame of EUV projection lithography, mainly because debris seriously limit both lifetime and performance of the expensive optics and filters put close to the plasma source. In this paper we present the experimental measurements of main debris characteristics (velocity, size, charge, momentum, spectral energy, spatial distribution). Then, we present the operating results of a patented debris mitigation systems (DMS) specifically designed to suppress debris with the measured characteristics. We achieved reduction factors ˜800 for atoms and nm-size clusters, and ˜1600 for particles larger than 500 nm. These results are at the forefront in this field. The excellent performance of our DMS was a breakthrough to achieve a 90-nm patterning on commercial resists by our micro-exposure tool EUV projection lithography.

  3. On the Importance of the Flare's Late Phase for the Solar Extreme Ultraviolet Irradiance

    NASA Technical Reports Server (NTRS)

    Woods, Thomas N.; Eparvier, Frank; Jones, Andrew R.; Hock, Rachel; Chamberlin, Phillip C.; Klimchuk, James A.; Didkovsky, Leonid; Judge, Darrell; Mariska, John; Bailey, Scott; Tobiska, W. Kent; Schrijver, Carolus J.; Webb, David F.; Warren, Harry

    2011-01-01

    The new solar extreme ultraviolet (EUV) irradiance observations from NASA Solar Dynamics Observatory (SDO) have revealed a new class of solar flares that are referred to as late phase flares. These flares are characterized by the hot 2-5 MK coronal emissions (e.g., Fe XVI 33.5 nm) showing large secondary peaks that appear many minutes to hours after an eruptive flare event. In contrast, the cool 0.7-1.5 MK coronal emissions (e.g., Fe IX 17.1 nm) usually dim immediately after the flare onset and do not recover until after the delayed second peak of the hot coronal emissions. We refer to this period of 1-5 hours after the fl amrea sin phase as the late phase, and this late phase is uniquely different than long duration flares associated with 2-ribbon flares or large filament eruptions. Our analysis of the late phase flare events indicates that the late phase involves hot coronal loops near the flaring region, not directly related to the original flaring loop system but rather with the higher post-eruption fields. Another finding is that space weather applications concerning Earth s ionosphere and thermosphere need to consider these late phase flares because they can enhance the total EUV irradiance flare variation by a factor of 2 when the late phase contribution is included.

  4. Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity

    NASA Astrophysics Data System (ADS)

    Kim, In-Seon; Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

    2016-04-01

    The usage of an extreme ultraviolet (EUV) pellicle is regarded as a potential solution for defect control because it can protect the mask from airborne debris. However, some obstacles disrupt realistic application of the pellicle, such as its structural weakness, the risk of thermal damage, and so on. For these reasons, flawless fabrication of the pellicle is impossible. We discuss the influence of a deformed pellicle in terms of the nonuniform intensity distribution and the critical dimension (CD) uniformity. When we consider a 16-nm periodic pattern with dipole illumination, a transmission difference (max-min) of 0.7% causes CD uniformity of 0.1 nm. The deflection of the aerial image caused by gravity is small enough to ignore. CD uniformity is <0.1 nm, even for the current gap of 2 mm between the mask and pellicle. However, wrinkling of the EUV pellicle, caused by heat, can cause serious image distortion because a wrinkled EUV pellicle experiences both transmission loss variation as well as CD nonuniformity. The local angle of a wrinkle (as opposed to the period or amplitude of a wrinkle) is the main factor that influences CD uniformity, and a local angle of <˜16 deg is needed to achieve 0.1-nm CD uniformity for a 16-nm L/S pattern.

  5. Extreme-ultraviolet collector mirror measurement using large reflectometer at NewSUBARU synchrotron facility

    NASA Astrophysics Data System (ADS)

    Iguchi, Haruki; Hashimoto, Hiraku; Kuki, Masaki; Harada, Tetsuo; Kinoshita, Hiroo; Watanabe, Takeo; Platonov, Yuriy Y.; Kriese, Michael D.; Rodriguez, Jim R.

    2016-06-01

    In extreme-ultraviolet (EUV) lithography, the development of high-power EUV sources is one of the critical issues. The EUV output power directly depends on the collector mirror performance. Furthermore, mirrors with large diameters are necessary to achieve high collecting performance and take sufficient distance to prevent heat and debris from a radiation point of the source. Thus collector mirror development with accurate reflectometer is important. We have developed a large reflectometer at BL-10 beamline of the NewSUBARU synchrotron facility that can be used for mirrors with diameters, thicknesses, and weights of up to 800 mm, 250 mm, and 50 kg, respectively. This reflectometer can measure reflectivity with fully s-polarized EUV light. In this study, we measured the reflectance of a 412-mm-diameter EUV collector mirror using a maximum incident angle of 36°. We obtained the peak reflectance, center wavelength and reflection bandwidth results and compared our results with Physikalisch-Technische Bundesanstalt results.

  6. Flat-field anastigmatic mirror objective for high-magnification extreme ultraviolet microscopy

    NASA Astrophysics Data System (ADS)

    Toyoda, Mitsunori

    2015-08-01

    To apply high-definition microscopy to the extreme ultraviolet (EUV) region in practice, i.e. to enable in situ observation of living tissue and the at-wavelength inspection of lithography masks, we constructed a novel reflective objective made of three multilayer mirrors. This objective is configured as a two-stage imaging system made of a Schwarzschild two-mirror system as the primary objective and an additional magnifier with a single curved mirror. This two-stage configuration can provide a high magnification of 1500, which is suitable for real-time observation with an EUV charge coupled device (CCD) camera. Besides, since off-axis aberrations can be corrected by the magnifier, which provides field flattener optics, we are able to configure the objective as a flat-field anastigmatic system, in which we will have a diffraction-limited spatial resolution over a large field-of-view. This paper describes in detail the optical design of the present objective. After calculating the closed-form equations representing the third-order aberrations of the objective, we apply these equations to practical design examples with a numerical aperture of 0.25 and an operation wavelength of 13.5 nm. We also confirm the imaging performances of this novel design by using the numerical ray-tracing method.

  7. Extreme ultraviolet imaging of three-dimensional magnetic reconnection in a solar eruption

    PubMed Central

    Sun, J. Q.; Cheng, X.; Ding, M. D.; Guo, Y.; Priest, E. R.; Parnell, C. E.; Edwards, S. J.; Zhang, J.; Chen, P. F.; Fang, C.

    2015-01-01

    Magnetic reconnection, a change of magnetic field connectivity, is a fundamental physical process in which magnetic energy is released explosively, and it is responsible for various eruptive phenomena in the universe. However, this process is difficult to observe directly. Here, the magnetic topology associated with a solar reconnection event is studied in three dimensions using the combined perspectives of two spacecraft. The sequence of extreme ultraviolet images clearly shows that two groups of oppositely directed and non-coplanar magnetic loops gradually approach each other, forming a separator or quasi-separator and then reconnecting. The plasma near the reconnection site is subsequently heated from ∼1 to ≥5 MK. Shortly afterwards, warm flare loops (∼3 MK) appear underneath the hot plasma. Other observational signatures of reconnection, including plasma inflows and downflows, are unambiguously revealed and quantitatively measured. These observations provide direct evidence of magnetic reconnection in a three-dimensional configuration and reveal its origin. PMID:26113464

  8. Considerations for a free-electron laser-based extreme-ultraviolet lithography program

    NASA Astrophysics Data System (ADS)

    Hosler, Erik R.; Wood, Obert R.; Barletta, William A.; Mangat, Pawitter J. S.; Preil, Moshe E.

    2015-03-01

    Recent years have seen great strides in the development of extreme ultraviolet (EUV) laser-produced plasma sources. Field deployed EUV exposure tools are now capable of facilitating advanced technology node development. Nevertheless, as the required manufacturing exposure dose scales, EUV sources must follow suit and provide 500- 1000 W to maintain production throughputs. A free-electron laser (FEL) offers a cost effective, single-source alternative for powering an entire EUV lithography program. FEL integration into semiconductor fab architecture will require both unique facility considerations as well as a paradigm shift in lithography operations. Critical accelerator configurations relating to energy recovery, multi-turn acceleration, and operational mode are discussed from engineering/scientific, cost-minimization, and safety perspectives. Furthermore, the individual components of a FEL (electron injector, RF systems, undulator, etc.) are examined with respect to both design and cost, considering existing technology as well as prospective innovations. Finally, FEL development and deployment roadmaps are presented, focusing on manufacturer deployment for the 5 nm or 3 nm technology nodes.[1-3

  9. Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks

    SciTech Connect

    Spector, S. J.; White, D. L.; Tennant, D. M.; Ocola, L. E.; Novembre, A. E.; Peabody, M. L.; Wood, O. R. II

    1999-11-01

    We have developed two new methods for at-wavelength inspection of mask blanks for extreme-ultraviolet (EUV) lithography. In one method an EUV photoresist is applied directly to a mask blank which is then flood exposed with EUV light and partially developed. In the second method, the photoresist is applied to an EUV transparent membrane that is placed in close proximity to the mask and then exposed and developed. Both reflectivity defects and phase defects alter the exposure of the resist, resulting in mounds of resist at defect sites that can then be located by visual inspection. In the direct application method, a higher contrast resist was shown to increase the height of the mounds, thereby improving the sensitivity of the technique. In the membrane method, a holographic technique was used to reconstruct an image of the mask, revealing the presence of very small defects, approximately 0.2 {mu}m in size. The demonstrated clean transfer of phase and amplitude defects to resist features on a membrane will be important when flagging defects in an automatic inspection tool. (c) 1999 American Vacuum Society.

  10. Extreme ultraviolet and x-ray transition wavelengths in Rb XXIV

    NASA Astrophysics Data System (ADS)

    Indu, Khatri; Arun, Goyal; Sunny, Aggarwal; K. Singh, A.; Man, Mohan

    2015-10-01

    Energy levels, radiative rates, oscillator strengths and line strengths are reported for transitions among the lowest 97 levels of the (1s22s22p6) 3s23p2, 3s23p3d, 3s3p3, 3p4, 3s3p23d, and 3s23d2 configurations of Rb XXIV. A multiconfiguration Dirac-Fock (MCDF) method is adopted for the calculations. Radiative rates, oscillator strengths, and line strengths are provided for all electric dipole (E1), magnetic dipole (M1), electric quadrupole (E2), and magnetic quadrupole (M2) transitions from the ground level to all 97 levels, although calculations are performed for a much larger number of levels. To achieve the accuracy of the data, comparisons are provided with similar data obtained from the Flexible Atomic Code (FAC) and also with the available theoretical and experimental results. Our energy levels are found to be accurate to better than 1.2%. Wavelengths calculated are found to lie in EUV (extreme ultraviolet) and x-ray regions. Additionally, lifetimes for all 97 levels are obtained for the first time. The authors, Indu Khatri and Arun Goyal, were supported by the U. G. C., India for their Junior Research Fellowship and Man Mohan by the U.G.C. for Basic Science Research Fellowship.

  11. DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)

    NASA Astrophysics Data System (ADS)

    Yakshinskiy, B. V.; Wasielewski, R.; Loginova, E.; Hedhili, M. N.; Madey , T. E.

    2008-10-01

    The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions [high vacuum, and 13.5 nm (92 eV) photons]. Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H 2O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is ˜6 × 10 -19 cm 2. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is ˜0.02 electrons/photon at 92 eV.

  12. Imaging extreme ultraviolet spectrometer employing a single toroidal diffraction grating: the initial evaluation.

    PubMed

    Huber, M C; Timothy, J G; Morgan, J S; Lemaitre, G; Tondello, G; Jannitti, E; Scarin, P

    1988-08-15

    A high-efficiency extreme ultraviolet (EUV) imaging spectrometer has been constructed and tested. The spectrometer employs a concave toroidal grating illuminated at normal incidence in a Rowland circle mounting and has only one reflecting surface. The toroidal grating has been fabricated by a new technique employing an elastically deformable submaster grating which is replicated in a spherical form and then mechanically distorted to produce the desired aspect ratio of the toroidal surface for stigmatic imaging over the selected wavelength range. The fixed toroidal grating used in the spectrometer is then replicated from this surface. Photographic tests and initial photoelectric tests with a 2-D pulse-counting detector system have verified the image quality of the toroidal grating at wavelengths near 600 A. The results of these initial tests are described in detail, and the basic designs of two instruments which could employ the imaging spectrometer for astrophysical investigations in space are briefly described, namely, a high-resolution EUV spectroheliometer for studies of the solar chromosphere, transition region, and corona and an EUV spectroscopic telescope for studies of nonsolar objects. PMID:20539406

  13. CO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology

    NASA Astrophysics Data System (ADS)

    Nowak, K. M.; Ohta, T.; Suganuma, T.; Fujimoto, J.; Mizoguchi, H.; Sumitani, A.; Endo, A.

    2013-12-01

    It was shown both theoretically and experimentally that nanosecond order laser pulses at 10.6 micron wavelength were superior for driving the Sn plasma extreme ultraviolet (EUV) source for nano-lithography for the reasons of higher conversion efficiency, lower production of debris and higher average power levels obtainable in CO2 media without serious problems of beam distortions and nonlinear effects occurring in competing solid-state lasers at high intensities. The renewed interest in such pulse format, wavelength, repetition rates in excess of 50 kHz and average power levels in excess of 18 kiloWatt has sparked new opportunities for a matured multi-kiloWatt CO2 laser technology. The power demand of EUV source could be only satisfied by a Master-Oscillator-Power-Amplifier system configuration, leading to a development of a new type of hybrid pulsed CO2 laser employing a whole spectrum of CO2 technology, such as fast flow systems and diffusion-cooled planar waveguide lasers, and relatively recent quantum cascade lasers. In this paper we review briefly the history of relevant pulsed CO2 laser technology and the requirements for multi-kiloWatt CO2 laser, intended for the laser-produced plasma EUV source, and present our recent advances, such as novel solid-state seeded master oscillator and efficient multi-pass amplifiers built on planar waveguide CO2 lasers.

  14. A Molecular- and Nano-Electronics Test (MONET) platform fabricated using extreme ultraviolet lithography.

    SciTech Connect

    Dentinger, Paul M.; Cardinale, Gregory F.; Hunter, Luke L.; Talin, Albert Alec

    2003-12-01

    We describe the fabrication and characterization of an electrode array test structure, designed for electrical probing of molecules and nanocrystals. We use Extreme Ultraviolet Lithography (EUVL) to define the electrical test platform features. As fabricated, the platform includes nominal electrode gaps of 0 nm, 40 nm, 60 nm, and 80 nm. Additional variation in electrode gap is achieved by controlling the exposure conditions, such as dose and focus. To enable EUVL based nanofabrication, we develop a novel bi-level photoresist process. The bi-level photoresist consists of a combination of a commercially available polydimethylglutarimide (PMGI) bottom layer and an experimental EUVL photoresist top (imaging) layer. We measure the sensitivity of PMGI to EUV exposure dose as a function of photoresist pre-bake temperature, and using this data, optimize a metal lift-off process. Reliable fabrication of 700 Angstrom thick Au structures with sub-1000 Angstrom critical dimensions is achieved, even without the use of a Au adhesion layer, such as Ti. Several test platforms are used to characterize electrical properties of organic molecules deposited as self assembled monolayers.

  15. Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

    SciTech Connect

    WRONOSKY,JOHN B.; SMITH,TONY G.; CRAIG,MARCUS J.; STURGIS,BEVERLY R.; DARNOLD,JOEL R.; WERLING,DAVID K.; KINCY,MARK A.; TICHENOR,DANIEL A.; WILLIAMS,MARK E.; BISCHOFF,PAUL

    2000-01-27

    This paper is an overview of the wafer and reticle positioning system of the Extreme Ultraviolet Lithography (EUVL) Engineering Test Stand (ETS). EUVL represents one of the most promising technologies for supporting the integrated circuit (IC) industry's lithography needs for critical features below 100nm. EUVL research and development includes development of capabilities for demonstrating key EUV technologies. The ETS is under development at the EUV Virtual National Laboratory, to demonstrate EUV full-field imaging and provide data that supports production-tool development. The stages and their associated metrology operated in a vacuum environment and must meet stringent outgassing specifications. A tight tolerance is placed on the stage tracking performance to minimize image distortion and provide high position repeatability. The wafer must track the reticle with less than {+-}3nm of position error and jitter must not exceed 10nm rms. To meet these performance requirements, magnetically levitated positioning stages utilizing a system of sophisticated control electronics will be used. System modeling and experimentation have contributed to the development of the positioning system and results indicate that desired ETS performance is achievable.

  16. Ultrafast measurements of the magnetic and structural phase transition of FeRh in the extreme ultraviolet range

    NASA Astrophysics Data System (ADS)

    Zusin, Dmitriy; Grychtol, Patrik; Turgut, Emrah; Kapteyn, Henry; Murnane, Margaret; Knut, Ronny; Shaw, Justin; Nembach, Hans; Silva, Thomas; Ceballos, Alejandro; Bordel, Catherine; Fischer, Peter; Hellman, Frances

    2014-03-01

    The temperature dependent transition from the anti-ferromagnetic to the ferromagnetic phase in FeRh is accompanied by a modification of its crystal lattice. In spite of extensive investigations, the interplay between the magnetic and the structural transition is still a matter of strong debate. A better understanding of the phase transition mechanism(s) is important, since the transition can be induced by femtosecond laser pulses and does not seem to be limited by heat transfer, as is the case in magnetic phase transitions that occur on longer (nanosecond) time scales. In this work, we use extreme ultraviolet radiation generated by a tabletop high harmonics source to perform element-selective investigations of the temperature-dependent magneto-optical response of a thin film FeRh sample. We study the optically induced phase transition using two ultrafast pump-probe spectroscopy approaches: by monitoring the time-resolved transversal magneto-optical Kerr effect (T-MOKE) and the transient change in reflectivity. P.F. acknowledges support from BES MSD DOE # DE-AC02-05-CH11231 and JILA from DOE # DE-FG02-09ER4665.

  17. Extreme ultraviolet and soft X-ray imaging with compact, table top laser plasma EUV and SXR sources

    NASA Astrophysics Data System (ADS)

    Wachulak, P. W.; Bartnik, A.; Kostecki, J.; Wegrzynski, L.; Fok, T.; Jarocki, R.; Szczurek, M.; Fiedorowicz, H.

    2015-12-01

    We present a few examples of imaging experiments, which were possible using a compact laser-plasma extreme ultraviolet (EUV) and soft X-ray (SXR) source, based on a double stream gas puff target. This debris-free source was used in full-field EUV imaging to obtain magnified images of test samples, ZnO nanofibers and images of the membranes coated with salt crystals. The source was also employed for SXR microscopy in the "water-window" spectral range using grazing incidence Wolter type-I objective to image test samples and to perform the initial studies of biological objects. Gas puff target EUV source, spectrally tuned for 13.5 nm wavelength with multilayer mirror and thin film filters, was also used in variety of shadowgraphy experiments to study the density of newly developed modulated density gas puff targets. Finally, the source was also employed in EUV tomography experiments of low density objects with the goal to measure and optimize the density of the targets dedicated to high harmonic generation.

  18. Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography

    SciTech Connect

    Park, Y. R.; Ahn, J. H.; Kim, J. S.; Kwon, B. S.; Lee, N.-E.; Kang, H. Y.; Hwangbo, C. K.; Ahn, Jinho; Seo, Hwan Seok

    2010-07-15

    Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics with a completely different configuration than those of conventional photolithography. This study investigated the etching properties of indium tin oxide (ITO) binary mask materials for EUVL, such as ITO (absorber layer), Ru (capping/etch-stop layer), and a Mo-Si multilayer (reflective layer), by varying the Cl{sub 2}/Ar gas flow ratio, dc self-bias voltage (V{sub dc}), and etch time in inductively coupled plasmas. The ITO absorber layer needs to be etched with no loss in the Ru layer on the Mo-Si multilayer for fabrication of the EUVL ITO binary mask structure proposed here. The ITO layer could be etched with an infinitely high etch selectivity over the Ru etch-stop layer in Cl{sub 2}/Ar plasma even with a very high overetch time.

  19. Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi; Oshima, Akihiro; Oyama, Tomoko G.; Ito, Kenta; Sugahara, Kigen; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi; Hanabata, Makoto

    2014-11-01

    The application of natural linear polysaccharide to green resist polymers was demonstrated for electron beam (EB) and extreme-ultraviolet (EUV) lithography using organic-solvent-free water spin-coating and tetramethylammonium hydroxide (TMAH)-free water-developable techniques. The water spin-coating and water-developable processes in a green resist material were carried out on wafers because of the water solubility of natural polysaccharides for an environmentally friendly manufacturing process for next-generation electronic devices. The developed green resist material with a weight-average molecular weight of 83,000 and 70 mol % hydroxyl groups as a water-developable feature was found to have acceptable properties such as spin-coat ability on 200 mm wafers, prediction sensitivity to EUV at the wavelengths of 6.7 and 13.5 nm, a high contrast of the water dissolution rate before and after EB irradiation, pillar patterns of 100-400 nm with a high EB sensitivity of 10 µC/cm2, and etch selectivity with a silicon-based middle layer in CF4 plasma treatment.

  20. Development of extreme ultraviolet and soft x-ray multilayer optics for scientific studies with femtosecond/attosecond sources

    SciTech Connect

    Aquila, Andrew Lee

    2009-05-21

    The development of multilayer optics for extreme ultraviolet (EUV) radiation has led to advancements in many areas of science and technology, including materials studies, EUV lithography, water window microscopy, plasma imaging, and orbiting solar physics imaging. Recent developments in femtosecond and attosecond EUV pulse generation from sources such as high harmonic generation lasers, combined with the elemental and chemical specificity provided by EUV radiation, are opening new opportunities to study fundamental dynamic processes in materials. Critical to these efforts is the design and fabrication of multilayer optics to transport, focus, shape and image these ultra-fast pulses This thesis describes the design, fabrication, characterization, and application of multilayer optics for EUV femtosecond and attosecond scientific studies. Multilayer mirrors for bandwidth control, pulse shaping and compression, tri-material multilayers, and multilayers for polarization control are described. Characterization of multilayer optics, including measurement of material optical constants, reflectivity of multilayer mirrors, and metrology of reflected phases of the multilayer, which is critical to maintaining pulse size and shape, were performed. Two applications of these multilayer mirrors are detailed in the thesis. In the first application, broad bandwidth multilayers were used to characterize and measure sub-100 attosecond pulses from a high harmonic generation source and was performed in collaboration with the Max-Planck institute for Quantum Optics and Ludwig- Maximilians University in Garching, Germany, with Professors Krausz and Kleineberg. In the second application, multilayer mirrors with polarization control are useful to study femtosecond spin dynamics in an ongoing collaboration with the T-REX group of Professor Parmigiani at Elettra in Trieste, Italy. As new ultrafast x-ray sources become available, for example free electron lasers, the multilayer designs

  1. Systematic investigation of self-absorption and conversion efficiency of 6.7 nm extreme ultraviolet sources

    SciTech Connect

    Otsuka, Takamitsu; Higashiguchi, Takeshi; Yugami, Noboru; Yatagai, Toyohiko; Kilbane, Deirdre; Dunne, Padraig; O'Sullivan, Gerry; Jiang, Weihua; Endo, Akira

    2010-12-06

    We have investigated the dependence of the spectral behavior and conversion efficiencies of rare-earth plasma extreme ultraviolet sources with peak emission at 6.7 nm on laser wavelength and the initial target density. The maximum conversion efficiency was 1.3% at a laser intensity of 1.6x10{sup 12} W/cm{sup 2} at an operating wavelength of 1064 nm, when self-absorption was reduced by use of a low initial density target. Moreover, the lower-density results in a narrower spectrum and therefore improved spectral purity. It is shown to be important to use a low initial density target and/or to produce low electron density plasmas for efficient extreme ultraviolet sources when using high-Z targets.

  2. Final Calibration of the Berkeley Extreme and Far-Ultraviolet Spectrometer on the ORFEUS-SPAS I and II Missions

    NASA Astrophysics Data System (ADS)

    Dixon, W. Van Dyke; Dupuis, Jean; Hurwitz, Mark

    2002-01-01

    The Berkeley Extreme and Far-Ultraviolet Spectrometer flew as part of the ORFEUS telescope on the ORFEUS-SPAS I and II space shuttle missions in 1993 and 1996, respectively. The data obtained by this instrument have now entered the public domain. To facilitate their use by the astronomical community, we have reextracted and recalibrated both data sets, converted them into a standard (FITS) format, and placed them in the Multimission Archive at STScI (MAST). Our final calibration yields improved wavelength scales and effective area curves for both data sets. Based on the development and utilization of the Orbiting and Retrievable Far and Extreme Ultraviolet Spectrometers (ORFEUS), a collaboration of the Institute for Astronomy and Astrophysics at the University of Tübingen, the Space Astrophysics Group of the University of California, Berkeley, and the Landessternwarte Heidelberg.

  3. Diffuse Extreme-Ultraviolet Emission from the Coma Cluster: Evidence for Rapidly Cooling Gases at Submegakelvin Temperatures

    PubMed

    Lieu; Mittaz; Bowyer; Breen; Lockman; Murphy; Hwang

    1996-11-22

    The central region of the Coma cluster of galaxies was observed in the energy band from 0.065 to 0.245 kiloelectron volts by the Deep Survey telescope aboard the Extreme Ultraviolet Explorer. A diffuse emission halo of angular diameter approximately 30 arc minutes was detected. The extreme-ultraviolet (EUV) emission level exceeds that expected from the x-ray temperature gas in Coma. This halo suggests the presence of two more phases in the emitting gas, one at a temperature of approximately 2 x 10(6) kelvin and the other at approximately 8 x 10(5) kelvin. The latter phase cools rapidly and, in steady state, would have produced cold matter with a mass of approximately 10(14) solar masses within the EUV halo. Although a similar EUV enhancement was discovered in the Virgo cluster, this detection in Coma applies to a noncooling flow system. PMID:8910264

  4. Note: Development of a volume-limited dot target for a high brightness extreme ultraviolet microplasma source

    SciTech Connect

    Dinh, Thanh Hung Suzuki, Yuhei; Hara, Hiroyuki; Higashiguchi, Takeshi; Hirose, Ryoichi; Ohashi, Hayato; Li, Bowen; Dunne, Padraig; O’Sullivan, Gerry; Sunahara, Atsushi

    2014-11-15

    We report on production of volume-limited dot targets based on electron beam lithographic and sputtering technologies for use in efficient high brightness extreme ultraviolet microplasma sources. We successfully produced cylindrical tin (Sn) targets with diameters of 10, 15, and 20 μm and a height of 150 nm. The calculated spectrum around 13.5 nm was in good agreement with that obtained experimentally.

  5. ACTIVE REGION MOSS: DOPPLER SHIFTS FROM HINODE/EXTREME-ULTRAVIOLET IMAGING SPECTROMETER OBSERVATIONS

    SciTech Connect

    Tripathi, Durgesh; Mason, Helen E.; Klimchuk, James A.

    2012-07-01

    Studying the Doppler shifts and the temperature dependence of Doppler shifts in moss regions can help us understand the heating processes in the core of the active regions. In this paper, we have used an active region observation recorded by the Extreme-ultraviolet Imaging Spectrometer (EIS) on board Hinode on 2007 December 12 to measure the Doppler shifts in the moss regions. We have distinguished the moss regions from the rest of the active region by defining a low-density cutoff as derived by Tripathi et al. in 2010. We have carried out a very careful analysis of the EIS wavelength calibration based on the method described by Young et al. in 2012. For spectral lines having maximum sensitivity between log T = 5.85 and log T = 6.25 K, we find that the velocity distribution peaks at around 0 km s{sup -1} with an estimated error of 4-5 km s{sup -1}. The width of the distribution decreases with temperature. The mean of the distribution shows a blueshift which increases with increasing temperature and the distribution also shows asymmetries toward blueshift. Comparing these results with observables predicted from different coronal heating models, we find that these results are consistent with both steady and impulsive heating scenarios. However, the fact that there are a significant number of pixels showing velocity amplitudes that exceed the uncertainty of 5 km s{sup -1} is suggestive of impulsive heating. Clearly, further observational constraints are needed to distinguish between these two heating scenarios.

  6. Analysis of Cassini UVIS Extreme and Far Ultraviolet Observations of Saturn’s Atmosphere

    NASA Astrophysics Data System (ADS)

    Parkinson, Christopher D.; Koskinen, Tommi; Gronoff, Guillaume; Yung, Yuk L.; Esposito, Larry

    2015-11-01

    The atmosphere of Saturn is mainly composed of H2 and neutral atomic helium. The study of He 584 Å and H Lyman-α brightnesses is interesting as the EUV and FUV (Extreme and Far Ultraviolet) planetary airglow have the potential to yield useful information about mixing and other important parameters in its thermosphere. Time variation, asymmetries, and polar enhancement of the airglow are also possible and analysis already performed using the public archived Cassini mission data sets have shown we can solve some of the outstanding problems associated with these phenomena for Saturn.Specifically, we have (1) examined epochal eddy mixing disparities in the Saturnian upper atmosphere and quantify temporal mixing variations that may have occurred in the upper atmosphere of Saturn, as may be evidenced in Cassini mission data, (2) quantified any enhanced mixing in the auroral regions of Saturn, and (3) performed a robust study of Saturnian H Lyman-α brightness with the view to discover any longitudinal H Lyman-α planetary asymmetry or “bulge” across the disc such as was discovered by Voyager at Jupiter, indicative of the distribution of atomic H and accounting for the observed flux and any variations from the normal temperature profile.We have analyzed Cassini UVIS EUV and FUV airglow data from Saturn using sophisticated photochemical and radiative transfer models to investigate unexplained differences in the dynamical processes operating within its upper atmosphere. Powerful analysis techniques allow us to extract information on atmospheric mixing, temperatures, and temporal changes due to the solar and seasonal cycles from the variations in distribution and intensity of airglow emissions that result. We report on results of these efforts to date.

  7. A Comparative Study of the Mass Distribution of Extreme-Ultraviolet-selected White Dwarfs

    NASA Astrophysics Data System (ADS)

    Napiwotzki, R.; Green, Paul J.; Saffer, Rex A.

    1999-05-01

    We present new determinations of effective temperature, surface gravity, and masses for a sample of 46 hot DA white dwarfs selected from the Extreme Ultraviolet Explorer (EUVE) and ROSAT Wide Field Camera bright source lists in the course of a near-infrared survey for low-mass companions. Our analysis, based on hydrogen non-LTE model atmospheres, provides a map of LTE correction vectors, which allow a thorough comparison with previous LTE studies. We find that previous studies underestimate both the systematic errors and the observational scatter in the determination of white dwarf parameters obtained via fits to model atmospheres. The structure of very hot or low-mass white dwarfs depends sensitively on their history. To compute white dwarf masses, we thus use theoretical mass-radius relations that take into account the complete evolution from the main sequence. We find a peak mass of our white dwarf sample of 0.59 Msolar, in agreement with the results of previous analyses. However, we do not confirm a trend of peak mass with temperature reported in two previous analyses. Analogous to other EUV-selected samples, we note a lack of low-mass white dwarfs and a large fraction of massive white dwarfs. Only one white dwarf is likely to have a helium core. While the lack of helium white dwarfs in our sample can be easily understood from their high cooling rate, and therefore low detection probability in our temperature range, this is not enough to explain the large fraction of massive white dwarfs. This feature very likely results from a decreased relative sample volume for low-mass white dwarfs caused by interstellar absorption in EUV-selected samples. Spectral observations reported here were obtained with the Multiple Mirror Telescope, a joint facility of the University of Arizona and the Smithsonian Institution, and with the Bok telescope at the Steward Observatory of the University of Arizona.

  8. THE FIRST STRAY LIGHT CORRECTED EXTREME-ULTRAVIOLET IMAGES OF SOLAR CORONAL HOLES

    SciTech Connect

    Shearer, Paul; Gilbert, Anna C.; Frazin, Richard A.; Hero III, Alfred O. E-mail: annacg@umich.edu E-mail: hero@umich.edu

    2012-04-10

    Coronal holes are the source regions of the fast solar wind, which fills most of the solar system volume near the cycle minimum. Removing stray light from extreme-ultraviolet (EUV) images of the Sun's corona is of high astrophysical importance, as it is required to make meaningful determinations of temperatures and densities of coronal holes. EUV images tend to be dominated by the component of the stray light due to the long-range scatter caused by the microroughness of telescope mirror surfaces, and this component has proven very difficult to measure in pre-flight characterization. In-flight characterization heretofore has proven elusive due to the fact that the detected image is simultaneously nonlinear in two unknown functions: the stray light pattern and the true image that would be seen by an ideal telescope. Using a constrained blind deconvolution technique that takes advantage of known zeros in the true image provided by a fortuitous lunar transit, we have removed the stray light from solar images seen by the EUVI instrument on STEREO-B in all four filter bands (171, 195, 284, and 304 A). Uncertainty measures of the stray light corrected images, which include the systematic error due to misestimation of the scatter, are provided. It is shown that in EUVI, stray light contributes up to 70% of the emission in coronal holes seen on the solar disk, which has dramatic consequences for diagnostics of temperature and density and therefore estimates of key plasma parameters such as the plasma {beta} and ion-electron collision rates.

  9. Nonthermal phase transitions in semiconductors induced by a femtosecond extreme ultraviolet laser pulse

    NASA Astrophysics Data System (ADS)

    Medvedev, Nikita; Jeschke, Harald O.; Ziaja, Beata

    2013-01-01

    In this paper, we present a novel theoretical approach, which allows the study of nonequilibrium dynamics of both electrons and atoms/ions within free-electron laser excited semiconductors at femtosecond time scales. The approach consists of the Monte-Carlo method treating photoabsorption, high-energy-electron and core-hole kinetics and relaxation processes. Low-energy electrons localized within the valence and conduction bands of the target are treated with a temperature equation, including source terms, defined by the exchange of energy and particles with high-energy electrons and atoms. We follow the atomic motion with the molecular dynamics method on the changing potential energy surface. The changes of the potential energy surface and of the electron band structure are calculated at each time step with the help of the tight-binding method. Such a combination of methods enables investigation of nonequilibrium structural changes within materials under extreme ultraviolet (XUV) femtosecond irradiation. Our analysis performed for diamond irradiated with an XUV femtosecond laser pulse predicts for the first time in this wavelength regime the nonthermal phase transition from diamond to graphite. Similar to the case of visible light irradiation, this transition takes place within a few tens of femtoseconds and is caused by changes of the interatomic potential induced by ultrafast electronic excitations. It thus occurs well before the heating stimulated by electron-phonon coupling starts to play a role. This allows us to conclude that this transition is nonthermal and represents a general mechanism of the response of solids to ultrafast electron excitations.

  10. Impact of deformed extreme-ultraviolet pellicle in terms of CD uniformity

    NASA Astrophysics Data System (ADS)

    Kim, In-Seon; Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

    2015-07-01

    The usage of the extreme ultraviolet (EUV) pellicle is regarded as the solution for defect control since it can protect the mask from airborne debris. However some obstacles disrupt real-application of the pellicle such as structural weakness, thermal damage and so on. For these reasons, flawless fabrication of the pellicle is impossible. In this paper, we discuss the influence of deformed pellicle in terms of non-uniform intensity distribution and critical dimension (CD) uniformity. It was found that non-uniform intensity distribution is proportional to local tilt angle of pellicle and CD variation was linearly proportional to transmission difference. When we consider the 16 nm line and space pattern with dipole illumination (σc=0.8, σr=0.1, NA=0.33), the transmission difference (max-min) of 0.7 % causes 0.1 nm CD uniformity. Influence of gravity caused deflection to the aerial image is small enough to ignore. CD uniformity is less than 0.1 nm even for the current gap of 2 mm between mask and pellicle. However, heat caused EUV pellicle wrinkle might cause serious image distortion because a wrinkle of EUV pellicle causes a transmission loss variation as well as CD non-uniformity. In conclusion, local angle of a wrinkle, not a period or an amplitude of a wrinkle is a main factor to CD uniformity, and local angle of less than ~270 mrad is needed to achieve 0.1 nm CD uniformity with 16 nm L/S pattern.

  11. Partially Coherent Quantitative Phase Retrieval with Applications to Extreme Ultraviolet Lithography

    NASA Astrophysics Data System (ADS)

    Claus, Rene Andre

    This dissertation presents a new quantitative phase retrieval algorithm that fully models partially coherent imaging in microscopes. Unlike existing algorithms, our algorithm fully considers the pupil function and illumination by using the Weak Object Transfer Function (WOTF). Using an iterative approach, we extend the applicability of the WOTF beyond weakly scattering objects. This allows almost any measurement to be used during phase retrieval. As an example of how this feature can be used to invent practical new measurement schemes, we present the illumination switched pupil. This measurement uses a phase contrast objective and varied illumination to maximize the sensitivity of the microscope to both the phase and amplitude of the sample. Using only two images, the complex field can be recovered with high sensitivity at almost all spatial frequencies. A complete model of imaging in the microscope enables self-calibration of the measurements and improved phase retrieval. Since all important characteristics of the microscope can be incorporated, an optimization over critical parameters, such as the best focus position and image alignment, can be performed after the images have been captured. This allows errors in the calibration to be corrected after the measurements have been performed, improving the accuracy of the recovered field while simplifying the experiments. To verify and apply the algorithm experimentally, we have performed phase retrieval measurements of Extreme Ultraviolet (EUV) photomasks on the zone plate microscope, SHARP, at Lawrence Berkeley National Laboratory (LBNL). Phase retrieval has enabled the quantitative analysis of multilayer roughness and defects. Experiments, comparing the size of defects measured using phase retrieval to measurements performed by AFM, indicate that AFM consistently underestimates the effective height of the buried multilayer defects by 1 nm. Other measurements of defects, comparing the recovered field extracted from

  12. Profile reconstruction in extreme ultraviolet (EUV) scatterometry: modeling and uncertainty estimates

    NASA Astrophysics Data System (ADS)

    Gross, H.; Rathsfeld, A.; Scholze, F.; Bär, M.

    2009-10-01

    Scatterometry as a non-imaging indirect optical method in wafer metrology is also relevant to lithography masks designed for extreme ultraviolet lithography, where light with wavelengths in the range of 13 nm is applied. The solution of the inverse problem, i.e. the determination of periodic surface structures regarding critical dimensions (CD) and other profile properties from light diffraction patterns, is incomplete without knowledge of the uncertainties associated with the reconstructed parameters. The numerical simulation of the diffraction process for periodic 2D structures can be realized by the finite element solution of the two-dimensional Helmholtz equation. The inverse problem can be formulated as a nonlinear operator equation in Euclidean space. The operator maps the sought mask parameters to the efficiencies of diffracted plane wave modes. We employ a Gauß-Newton type iterative method to solve this operator equation and end up minimizing the deviation of the measured efficiency or phase shift values from the calculated ones. We apply our reconstruction algorithm for the measurement of a typical EUV mask composed of TaN absorber lines of about 80 nm height, a period in the range of 420 nm-840 nm, and with an underlying MoSi-multilayer stack of 300 nm thickness. Clearly, the uncertainties of the reconstructed geometric parameters essentially depend on the uncertainties of the input data and can be estimated by various methods. We apply a Monte Carlo procedure and an approximative covariance method to evaluate the reconstruction algorithm. Finally, we analyze the influence of uncertainties in the widths of the multilayer stack by the Monte Carlo method.

  13. Implications of image plane line-edge roughness requirements on extreme ultraviolet mask specifications

    SciTech Connect

    Naulleau, P. P.; George, Simi A.

    2009-02-13

    Line-edge roughness (LER) and the related effect of contact size variation remain as significant challenges facing the commercialization of extreme ultraviolet (EUV) lithography. LER is typically viewed as a resist problem; however, recent simulation results have shown that the mask can indeed be an important contributor. Problems arise from both mask absorber LER as well as mask multilayer roughness leading to random phase variations in the reflected beam (see Fig. 1). The latter effect is especially important as higher coherence off-axis illumination conditions are used and defocus is considered. Here we describe these effect in detail and explore how they will impact EUV mask requirements for the 22-nm half-pitch node and beyond. Figure 2 shows modeling results for 22-nm lines printed in a 0.32-numerical aperture system with 100-nm defocus assuming a mask with 0.24-nm rms multilayer roughness and no absorber edge roughness (unlike the example in Fig. 1). The impact of the phase roughness on the printed line-edge roughness is clearly evident and demonstrates the basic problem with mask roughness. The more detailed modeling-based analysis to be presented will account for performance throughout the process window as well as non-stochastic resist effects. We note that the mean-field resist effect is important to consider because, in practice, the resist is the limiting resolution element in the system and therefore dominates the mask-error enhancement factor (MEEF). As is typically the case with projection-optic-induced MEEF, the resist-induced MEEF will lead to even tighter mask requirements. Note that we do not consider resist stochastic effects since the purpose of this study is isolate mask-induced sources of image-plane roughness.

  14. Overlying extreme-ultraviolet arcades preventing eruption of a filament observed by AIA/SDO

    SciTech Connect

    Chen, Huadong; Ma, Suli; Zhang, Jun

    2013-11-20

    Using the multi-wavelength data from the Atmospheric Imaging Assembly/Solar Dynamic Observatory (AIA/SDO) and the Sun Earth Connection Coronal and Heliospheric Investigation/Solar Terrestrial Relations Observatory (SECCHI/STEREO), we report a failed filament eruption in NOAA AR 11339 on 2011 November 3. The eruption was associated with an X1.9 flare, but without any coronal mass ejection (CME), coronal dimming, or extreme ultraviolet (EUV) waves. Some magnetic arcades above the filament were observed distinctly in EUV channels, especially in the AIA 94 Å and 131 Å wavebands, before and during the filament eruption process. Our results show that the overlying arcades expanded along with the ascent of the filament at first until they reached a projected height of about 49 Mm above the Sun's surface, where they stopped. The following filament material was observed to be confined by the stopped EUV arcades and not to escape from the Sun. After the flare, a new filament formed at the low corona where part of the former filament remained before its eruption. These results support that the overlying arcades play an important role in preventing the filament from successfully erupting outward. We also discuss in this paper the EUV emission of the overlying arcades during the flare. It is rare for a failed filament eruption to be associated with an X1.9 class flare, but not with a CME or EUV waves. Therefore, this study also provides valuable insight into the triggering mechanism of the initiation of CMEs and EUV waves.

  15. Extreme-ultraviolet beam-foil spectroscopy of highly ionized neon and argon. Doctoral thesis

    SciTech Connect

    Demarest, J.A.

    1986-08-01

    A study of the extreme-ultraviolet radiation emitted by ion beams of highly ionized neon and argon after passage through thin foils was conducted. A grazing-incidence spectrometer was equipped with a position-sensitive microchannel plate (MCP) detector, which improved the detection efficiency by two orders of magnitude. The position information of the MCP was determined to be linear over 90% of the 50-mm-wide detector. Spectra spanning regions of over 100 A were accumulated at a resolution of less than 1 A. A wavelength calibration based on a second order equation of spectrometer position was found to result in an accuracy of - 0.1 A. Over 40 transitions of Ne VIII, Ne IX, and Ne X were observed in the wavelength region from 350 to 30 A from n=2-3,4,5; n=3-4,5,6,7,8; n=4-6,7; and n=5-9. An intensity calibration of the detection system allowed the determination of the relative populations of n=3 states of Ne VIII and Ne IX. An overpopulation of states with low orbital angular momenta support electron-capture predictions by the first-order Born approximation. The argon beam-foil data confirmed the wavelength predictions of 30 previously unobserved transitions in the wavlength region from 355 to 25 A from n=2-2; n=3-4; n=4-5,6,7; and n=6-8. Lifetime determinations were made by the simultaneous measurement of 26 argon lines in the spectral region from 295-180 A. Many of the n=2-2 transitions agreed well with theory.

  16. Geocentric position preliminary detection from the extreme ultraviolet images of Chang'E-3

    NASA Astrophysics Data System (ADS)

    Zheng, Chen; Ping, Jinsong; Wang, Mingyuan; Li, Wenxiao

    2015-08-01

    An Extreme ultraviolet (EUV) Camera was installed onboard the Chinese lunar surface landing mission, the Chang'E-3 lander, as a useful method to observe the Earth plasmasphere. This EUV optical payload obtained more than 600 moon-based Earth plasmasphere images since December 14, 2013. However, due to errors of unknown size and origin in the platform attitude control of the lander and in the EUV telescope pointing control during the mission operating periods, the geocentric coordinates in these EUV images are not fixed in the same position of CCD pixel. Before adequately calibrating, these positioning offsets will introduce extra errors into the analysis of the plasmaspheric structure. With only a little insufficient telemetry information, an effective calibrating method of circle-based differential algorithm is suggested and demonstrated, for automatically and precisely detecting the geocentric position in each EUV image of Chang'E-3 mission. In each EUV image, the tested method uses the outline of a circle as the basic unit to capture the contour for the bright region based on the spectral characteristic. Then, the center of the extracted circle is adopted as the geocentric position for the image. The preliminary analysis shows that this method can effectively detect the geocentric position being always consistent with the recognition result by the basic hand labor method. It is found that the radius of the circles varies from month to month from December, 2013 to May, 2014. The monthly averages of radius show relative notable positive correlation and negative correlation with the changes of both Zenith angle of the Earth at the landing area of Chang'E-3 lander, and the Earth-moon distance, respectively. This method and results here will benefit the Chang'E-3 EUV study.

  17. The extreme ultraviolet spectra of low-redshift radio-loud quasars

    NASA Astrophysics Data System (ADS)

    Punsly, Brian; Reynolds, Cormac; Marziani, Paola; O'Dea, Christopher P.

    2016-07-01

    This paper reports on the extreme ultraviolet (EUV) spectrum of three low-redshift (z ˜ 0.6) radio-loud quasars, 3C 95, 3C 57 and PKS 0405-123. The spectra were obtained with the Cosmic Origins Spectrograph of the Hubble Space Telescope. The bolometric thermal emission, Lbol, associated with the accretion flow is a large fraction of the Eddington limit for all of these sources. We estimate the long-term time-averaged jet power, overline{Q}, for the three sources. overline{Q}/L_{bol}, is shown to lie along the correlation of overline{Q}/L_{bol}, and αEUV found in previous studies of the EUV continuum of intermediate and high-redshift quasars, where the EUV continuum flux density between 1100 and 700 Å is defined by F_{ν } ˜ ν ^{-α _{EUV}}. The high Eddington ratios of the three quasars extend the analysis into a wider parameter space. Selecting quasars with high Eddington ratios has accentuated the statistical significance of the partial correlation analysis of the data. Namely, the correlation of overline{Q}/L_{bol} and αEUV is fundamental, and the correlation of overline{Q} and αEUV is spurious at a very high statistical significance level (99.8 per cent). This supports the regulating role of ram pressure of the accretion flow in magnetically arrested accretion models of jet production. In the process of this study, we use multifrequency and multiresolution Very Large Array radio observations to determine that one of the bipolar jets in 3C 57 is likely frustrated by galactic gas that keeps the jet from propagating outside the host galaxy.

  18. VizieR Online Data Catalog: Second Extreme Ultra-Violet Explorer Catalog (2EUVE, 1997)

    NASA Astrophysics Data System (ADS)

    Bowyer, S.; Lampton, M.; Lewis, J.; Wu, X.; Jelinsky, P.; Malina, R. F.

    2001-04-01

    The Extreme Ultraviolet Explorer satellite was launched on June 7, 1992 from Cape Canaveral, Florida on a Delta II rocket. The payload contains three EUV scanning telescopes equipped with imaging detectors as well as a Deep Survey Spectrometer instrument which divides the light from a fourth telescope between an imaging detector and three EUV spectrometers. There are three source tables in this catalogue: - table1 lists count rates and positions of 514 objects detected during the all-sky survey. - table2 lists 35 sources detected by the deep survey of half the ecliptic plane; three deep survey objects are also detected in the all sky survey. - table3 lists 188 sources that have been detected in other ways, principally by deep exposures with the scanner telescopes as part of the Right Angle Program or by long exposures with the deep survey instrument; table3 includes right angle detections through December 24, 1994. Because the objects listed in table3 have been derived with a variety of instruments and exposure strategies, the flux limits and detection thresholds vary over a wide range; interested readers should consult the reference listed. Each table has an associated list of identified sources, id1, id2 and id3 (one EUVE source may by associated to 0, one or more counterparts); in nearly all cases they lie within 1 arcmin of the actual source position. The 534 objects in the "faint" part were detected jointly in the EUVE and in the ROSAT X-Ray Telescope 0.25keV band (50Å). This joint selection criterion permits use of a low count rate threshold in each survey, roughly 60% of the threshold used in the EUVE all-sky surveys, and 166 of the objects listed in the "faint" part are new EUV sources, appearing in neither the Second EUVE Source Catalog (tables 1 to 3) nor the ROSAT Wide Field Camera Second Catalog (J/MNRAS/274/1165) (7 data files).

  19. Measurements of electron and proton heating temperatures from extreme-ultraviolet light images at 68 eV in petawatt laser experiments

    SciTech Connect

    Gu Peimin; Zhang, B.; Key, M. H.; Hatchett, S. P.; Barbee, T.; Freeman, R. R.; Akli, K.; Hey, D.; King, J. A.; Mackinnon, A. J.; Snavely, R. A.; Stephens, R. B.

    2006-11-15

    A 68 eV extreme-ultraviolet light imaging diagnostic measures short pulse isochoric heating by electrons and protons in petawatt laser experiments. Temperatures are deduced from the absolute intensities and comparison with modeling using a radiation hydrodynamics code.

  20. Analysis of the mechanical response of extreme ultraviolet lithography masks during electrostatic chucking

    NASA Astrophysics Data System (ADS)

    Nataraju, Madhura

    Stringent flatness requirements have been imposed for the front and back surfaces of Extreme Ultraviolet Lithography (EUVL) masks to ensure successful pattern transfer that satisfies the image placement error budget. During exposure an electrostatic chuck will be used to support and flatten the mask. The EUVL Mask and Chucking Standards, SEMI P-37 and SEMI P-40, specify the flatness of the two mask surfaces as well as the chucking surface to be within about 50 nm peak-to-valley. It is critical that the electrostatic chucking process and its effect on mask flatness be well-understood. The principal objective of this thesis is to develop a model that predicts the electrostatic chucking response of masks and the resulting flatness of the pattern surface using FE techniques and to validate this model with chucking experiments. Studies are performed to evaluate the definition of flatness as given in the SEMI standards and a more efficient representation is suggested. Classical plate theory is used to illustrate the effect of chuck thickness and stiffness on the chucking response of masks. A basic FE model is developed to demonstrate that the sum of the chuck shape and thickness variation of the mask are crucial to the response of the mask during chucking. FE models are also developed to model clamping using a bipolar Coulombic pin chuck used for this research. The initial geometry of the mask and chuck surfaces are created using interferometric flatness data. Chucking is simulated by the application of forces between the mask backside and the chuck surface. The final pattern surface shape is compared with experimental electrostatic chucking results. An experimental set-up is developed to validate the FE model predictions. This consists of a Zygo interferometer mounted on top of an optical table, inside a cleanroom, with the chuck and mask placed inside a vacuum chamber. Once the voltage is turned on, the pattern surface nonflatness is measured using the interferometer

  1. TWO TYPES OF EXTREME-ULTRAVIOLET BRIGHTENINGS IN AR 10926 OBSERVED BY HINODE/EIS

    SciTech Connect

    Lee, K.-S.; Moon, Y.-J.; Choe, G. S.; Kim, Sujin; Cho, Kyung-Suk; Imada, S.

    2011-07-20

    We have investigated seven extreme-ultraviolet (EUV) brightenings in the active region AR 10926 on 2006 December 2 observed by the EUV Imaging Spectrometer on board the Hinode spacecraft. We have determined their Doppler velocities and non-thermal velocities from 15 EUV spectral lines (log T = 4.7 - 6.4) by fitting each line profile to a Gaussian function. The Doppler velocity maps for different temperatures are presented to show the height dependence of the Doppler shifts. It is found that the active region brightenings show two distinct Doppler shift patterns. The type 1 brightening shows a systematic increase of Doppler velocity from -68 km s{sup -1} (strong blueshift) at log T = 4.7 to -2 km s{sup -1} (weak blueshift) at log T = 6.4, while the type 2 brightenings have Doppler velocities in the range from -20 km s{sup -1} to 20 km s{sup -1}. The type 1 brightening point is considered to sit in an upward reconnection outflow whose speed decreases with height. In both types of brightenings, the non-thermal velocity is found to be significantly enhanced at log T = 5.8 compared to the background region. We have also determined electron densities from line ratios and derived temperatures from emission measure loci using the CHIANTI atomic database. The electron densities of all brightenings are comparable to typical values in active regions (log N{sub e} = 9.9-10.4). The emission measure loci plots indicate that these brightenings should be multi-thermal whereas the background is isothermal. The differential emission measure as a function of temperature shows multiple peaks in the EUV brightening regions, while it has only a single peak (log T = 6.0) in the background region. Using Michelson Doppler Imager magnetograms, we have found that the type 1 brightening is associated with a canceling magnetic feature with a flux canceling rate of 2.4 x 10{sup 18} Mx hr{sup -1}. We also found the canceling magnetic feature and chromospheric brightenings in the type 1

  2. Determination of plasma temperatures and luminosities using multiple extreme-ultraviolet and X-ray filters

    NASA Technical Reports Server (NTRS)

    Wood, Brian E.; Brown, Alexander; Linsky, Jeffrey L.

    1995-01-01

    We carefully examine the techniques used to infer temperatures of stellar coronal plasmas from the count rates of several broadband instruments in the X-ray and extreme-ultraviolet spectral ranges. In particular, we determine to what extent temperatures can be constrained and the corresponding uncertainties in the luminosities and emission measures lowered by fitting simultaneously count rates from the Einstein imaging proportional counter (IPC), the ROSAT Position Sensitive Proportional Counter (PSPC), the ROSAT Wide Field Camera (WFC) (both filters), and the EXOSAT Low Energy Telescope (LET) with the 3-Lex filter. We use published plasma emissivities with solar photospheric abundances. Since it has been found that single-temperature plasmas do not fit IPC data well, we assume a two-temperature plasma model. We find that, even with count rates from all of the above filters and overly optimistic error estimates, it is still not possible to determine a unique two-temperature solution. However, since the use of count rates from many filters can reduce substantially the number of possible solutions, temperature solutions determined by other means can be tested. We carry out such an analysis on a set of 18 nearby late-type stars to determine possible two-temperature solutions using multifilter photometry, and we compare these results with the temperature solutions derived by Schmitt et al. (1990) using IPC spectral data. In general, the two-temperature fits derived from the IPC spectral data are inconsistent with our results, with our data implying that, for many stars, the two temperatures derived by the IPC may be too low by about a factor of 2. The EXOSAT transmission grating Spectrometer (TGS) spectra of capella and sigma(exp 2) CrB support this conclusion. For Procyon and 70 Oph, though, the presence of a temperature component cooler than a million degress (not detected by the IPC) is deduced. While our analysis suggests the existence of more than one temperature

  3. Ionization and dissociation dynamics of vinyl bromide probed by femtosecond extreme ultraviolet transient absorption spectroscopy

    SciTech Connect

    Lin, Ming-Fu; Neumark, Daniel M.; Gessner, Oliver; Leone, Stephen R.

    2014-02-14

    Strong-field induced ionization and dissociation dynamics of vinyl bromide, CH{sub 2}=CHBr, are probed using femtosecond extreme ultraviolet (XUV) transient absorption spectroscopy. Strong-field ionization is initiated with an intense femtosecond, near infrared (NIR, 775 nm) laser field. Femtosecond XUV pulses covering the photon energy range of 50-72 eV probe the subsequent dynamics by measuring the time-dependent spectroscopic features associated with transitions of the Br (3d) inner-shell electrons to vacancies in molecular and atomic valence orbitals. Spectral signatures are observed for the depletion of neutral C{sub 2}H{sub 3}Br, the formation of C{sub 2}H{sub 3}Br{sup +} ions in their ground (X{sup ~}) and first excited (A{sup ~}) states, the production of C{sub 2}H{sub 3}Br{sup ++} ions, and the appearance of neutral Br ({sup 2}P{sub 3/2}) atoms by dissociative ionization. The formation of free Br ({sup 2}P{sub 3/2}) atoms occurs on a timescale of 330 ± 150 fs. The ionic A{sup ~} state exhibits a time-dependent XUV absorption energy shift of ∼0.4 eV within the time window of the atomic Br formation. The yield of Br atoms correlates with the yield of parent ions in the A{sup ~} state as a function of NIR peak intensity. The observations suggest that a fraction of vibrationally excited C{sub 2}H{sub 3}Br{sup +} (A{sup ~}) ions undergoes intramolecular vibrational energy redistribution followed by the C–Br bond dissociation. The C{sub 2}H{sub 3}Br{sup +} (X{sup ~}) products and the majority of the C{sub 2}H{sub 3}Br{sup ++} ions are relatively stable due to a deeper potential well and a high dissociation barrier, respectively. The results offer powerful new insights about orbital-specific electronic processes in high field ionization, coupled vibrational relaxation and dissociation dynamics, and the correlation of valence hole-state location and dissociation in polyatomic molecules, all probed simultaneously by ultrafast table-top XUV spectroscopy.

  4. Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2013-04-01

    As the International Technology Roadmap for Semiconductors critical dimension uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. We will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for advanced extreme ultraviolet (EUV) lithography with 1D (dense lines) and 2D (dense contacts) feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CDs and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples. Mask stack reflectivity variations should also be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We also observed mask error enhancement factor (MEEF) through field fingerprints in the studied EUV cases. Variations of MEEF may play a role towards the total intrafield CDU and may need to be taken into account for EUV lithography. We characterized MEEF-through-field for the reviewed features, with results herein, but further analysis of this phenomenon is required. This comprehensive approach to quantifying the mask part of

  5. X ray, extreme and far ultraviolet optical thin films for space applications

    NASA Technical Reports Server (NTRS)

    Zukic, Muamer; Torr, Douglas G.; Kim, Jongmin

    1993-01-01

    Far and extreme ultraviolet optical thin film filters find many uses in space astronomy, space astrophysics, and space aeronomy. Spacebased spectrographs are used for studying emission and absorption features of the earth, planets, sun, stars, and the interstellar medium. Most of these spectrographs use transmission or reflection filters. This requirement has prompted a search for selective filtering coatings with high throughput in the FUV and EUV spectral region. Important progress toward the development of thin film filters with improved efficiency and stability has been made in recent years. The goal for this field is the minimization of absorption to get high throughput and enhancement of wavelength selection. The Optical Aeronomy Laboratory (OAL) at the University of Alabama in Huntsville has recently developed the technology to determine optical constants of bulk and film materials for wavelengths extending from x-rays (0.1 nm) to the FUV (200 nm), and several materials have been identified that were used for designs of various optical devices which previously have been restricted to space application in the visible and near infrared. A new design concept called the Pi-multilayer was introduced and applied to the design of optical coatings for wavelengths extending from x-rays to the FUV. Section 3 of this report explains the Pi-multilayer approach and demonstrates its application for the design and fabrication of the FUV coatings. Two layer Pi-stacks have been utilized for the design of reflection filters in the EUV wavelength range from 70 - 100 nm. In order to eliminate losses due to the low reflection of the imaging optics and increase throughput and out-of-band rejection of the EUV instrumentation we introduced a self-filtering camera concept. In the FUV region, MgF2 and LiF crystals are known to be birefringent. Transmission polarizers and quarterwave retarders made of MgF2 or LiF crystals are commercially available but the performances are poor. New

  6. Comparison of solar radio and extreme ultraviolet synoptic limb charts during the present solar maximum

    NASA Astrophysics Data System (ADS)

    Silva, A. J. Oliveira e.; Selhorst, C. L.; Simões, P. J. A.; Giménez de Castro, C. G.

    2016-08-01

    Aims: The present solar cycle is particular in many aspects: it had a delayed rising phase, it is the weakest of the last 100 yrs, and it presents two peaks separated by more than one year. To understand the impact of these characteristics on the solar chromosphere and coronal dynamics, images from a wide wavelength range are needed. In this work we use the 17 GHz radio continuum, which is formed in the upper chromosphere and the extreme ultraviolet (EUV) lines 304 and 171 Å, that come from the transition region (He ii, T ~ 6-8 × 104 K) and the corona (Fe IX, X, T ~ 106 K), respectively.We extend upon a previous similar analysis, and compare the mean equatorial and polar brightening behavior at radio and EUV wavelengths during the maximum of the present solar cycle, covering the period between 2010 and 2015. Methods: We analyze daily images at 304 and 171 Å obtained by the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory (SDO). The 17 GHz maps were obtained by the Nobeyama Radioheliograph (NoRH). To construct synoptic limb charts, we calculated the mean emission of delimited limb areas with 100'' wide and angular separation of 5°. Results: At the equatorial region, the results show a hemispheric asymmetry of the solar activity. The northern hemisphere dominance is coincident with the first sunspot number peak, whereas the second peak occurs concurrently with the increase in the activity at the south. The polar emission reflects the presence of coronal holes at both EUV wavelengths, moreover, the 17 GHz polar brightenings can be associated with the coronal holes. Until 2013, both EUV coronal holes and radio polar brightenings were more predominant at the south pole.Since then they have not been apparent in the north, but thus appear in the beginning of 2015 in the south as observed in the synoptic charts. Conclusions: This work strengthens the association between coronal holes and the 17 GHz polar brightenings as it is evident in the

  7. The solar extreme ultra-violet corona: Resolved loops and the unresolved active region corona

    NASA Astrophysics Data System (ADS)

    Cirtain, Jonathan Wesley

    In this work, physical characteristics of the solar corona as observed in the Extreme Ultra-Violet (EUV) regime are investigated. The focus will be the regions of intense EUV radiation generally found near the locations of sunspots. These regions are commonly called active regions. Multiple space- based observing platforms have been deployed in the last decade; it is possible to use several of these observatories in combination to develop a more complete picture of the solar corona. Joint Observing Program 146 was created to collect spectroscopic intensities using the Coronal Diagnostic Spectrometer on Solar and Heliospheric Observatory and EUV images using NASA's Transition Region and Coronal Explorer. The emission line intensities are analyzed to develop an understanding of the temperature and density of the active region coronal plasma. However, the performance of the CDS instrument in the spatial and temporal domains is limited and to compensate for these limitations, data collected by the TRACE instrument provide a high spatial and temporal resolution set of observations. One of the most exciting unsolved problems in solar astrophysics is to understand why the corona maintains a temperature roughly two orders of magnitude higher than the underlying material. A detailed investigation of the coronal emission has provided constraints on models of the heating mechanism, since the temperature, density and evolution of emission rates for multiple ionic species are indicative of the mechanism(s) working to heat the corona. The corona appears to consist of multiple unresolved structures as well as resolved active region structures, called coronal loops. The purpose of the present work is to determine the characteristics of the unresolved background corona. Using the characterizations of the coronal unresolved background, results for loops after background subtraction are also presented. This work demonstrates the magnitude of the unresolved coronal emission with

  8. Thermally Averaged Collision Strengths for Extreme-ultraviolet Line of Fe IX

    NASA Astrophysics Data System (ADS)

    Tayal, S. S.; Zatsarinny, O.

    2015-10-01

    Collision strengths and thermally averaged collision strengths for a large number of extreme-ultraviolet lines of Fe ix arising by electron impact have been reported. The thermally averaged collision strengths are calculated at electron temperatures in the range 104-107 K for the 122,043 forbidden and allowed transitions between the 370 fine-structure levels. The atomic parameters for Fe ix play an important role in modeling of various astrophysical plasmas, including especially the solar corona. The B-spline Breit-Pauli R-matrix method has been used in the calculation of collision strengths. The target wave functions and transition probabilities have been determined by combining the multiconfiguration Hartree-Fock method with the B-spline box-based multichannel expansions. We have included 370 fine-structure levels of Fe ix in the energy region up to 3{s}23{p}55s states. The close-coupling expansion includes levels of the 3{s}23{p}6, 3{s}23{p}53d,4l,5s, 3s3{p}63d,4s,4p, 3{s}23{p}43{d}2, 3s3{p}53{d}2 configurations and some low-lying levels of the 3{s}23{p}33{d}3 configuration in our collision strengths and transition probabilities calculations. There is a good agreement with the previous R-matrix collision strength calculations by Storey et al. and Del Zanna et al. for transitions between the lowest 17 levels of the 3{s}23{p}6, 3{s}23{p}53d, and 3s3{p}63d configurations, especially for electron temperatures log T(K) ≥ 5.0. The transitions between the first 17 levels are dominated by Rydberg series of resonances converging to the levels of the 3{s}23{p}43{d}2 configuration. The present results and the calculation of Del Zanna et al. show significant differences for many weaker forbidden and intercombination transitions with thermally averaged collision strengths smaller than 0.01.

  9. Using extreme ultraviolet images and total electron content to study the Earth's plasmasphere

    NASA Astrophysics Data System (ADS)

    Galvan, David Andrew

    This dissertation employs extreme ultraviolet (EUV) imaging and total electron content (TEC) measurements to study the spatial structure and temporal variability of the Earth's plasmasphere. Photometry of global EUV images yields estimates of diurnal variation in column integrated He + density, as well as the deviation of the plasmasphere's motion from strict corotation. Case-study comparisons of EUV imagery with simultaneous TEC measurements derived from GPS radio signals yield radial profiles of electron and He + column abundance along the same lines of sight. Three-dimensional tomographic reconstructions of plasmaspheric electron density using TEC measurements are performed for the first time, and we evaluate the promise and limitations of TEC tomography for 3D imaging of the plasmasphere. We find that He + column abundance along a plasmaspheric flux tube tends to rise in the morning sector, stagnate around local noon, then rise again in the afternoon sector until ~ 20 MLT, where it peaks at a value 1.5 to 2 times the value at dawn. The mean rotation rate of the plasmasphere is observed to be between 88% and 95% of strict corotation, depending on L-shell, and can be highly variable even at L-shells as low as 2.5. Weak but significant correlations between rotation rate and indices of geomagnetic and auroral activity suggest multiple causes of this variability in rotation, including ionospheric winds and magnetospheric convection. Radial profiles of the column abundance of electrons and He + suggest that electrons fall off more quickly than He + at low L, leading to an increasing relative proportion of He + near L=2.5. Three-dimensional tomography of the plasmasphere is limited by satellite orbit geometry and lack of vertical resolution, but data assimilation of TEC into physics-based models can result in more realistic density reconstructions than can be produced by models alone. This research produces the first global observations of diurnal plasmaspheric

  10. Mechanism of extreme ultraviolet photoresist development with a supercritical CO2 compatible salt.

    PubMed

    Zweber, Amy E; Wagner, Mark; DeYoung, James; Carbonell, Ruben G

    2009-06-01

    The mechanism of developing an extreme ultraviolet (EUV) commercial photoresist with supercritical carbon dioxide (scCO2) and a CO2 compatible salt (CCS) solution was studied. The cloud point of CCS in CO2 and the pressure at which the photoresist dissolves in CCS/scCO2 were determined for temperatures between 35 and 50 degrees C. For this temperature range, it was found that the CCS cloud point ranges between 11.2 and 16.1 MPa, while the photoresist dissolution point ranges from 15.5 to 21.3 MPa. The kinetics of the CCS/scCO2 development was modeled using a simplified rate equation, where the rate-limiting steps were photoresist dissolution and mass transfer. The effects of temperature, mass transfer, pressure, and CCS concentration on photoresist removal rate were further explored experimentally using a high-pressure quartz crystal microbalance (QCM). Increasing temperature (35-50 degrees C) at a constant fluid density of 0.896 g/mL was found to increase the removal rate following an Arrhenius behavior with a photoresist dissolution energy of activation, Ea, equal to 79.0 kJ/mol. The removal was zero order in CCS concentration, signifying photoresist phase transfer, photoresist mass transfer, or both were rate limiting. Mass transfer studies showed that circulation enhanced the photoresist removal rate, but that the mass transfer coefficient was independent of temperature from 35 degrees C to 50 degrees C. In pressure studies, increasing pressure (27.6-34.5 MPa) at a constant temperature of 40 degrees C increased the removal rate by enhancing the fluid density, but at 50 degrees C increasing pressure had little effect on the removal rate. When the total CCS concentration was in large global excess over the number of Bronsted acid groups in the polymer (2400:1 at 5 mM CCS concentration), the mass of photoresist removed varied linearly with time. At lower CCS concentrations but still in global excess of the number of Bronsted acid groups, the photoresist removal

  11. Cylindrical plasmas generated by an annular beam of ultraviolet light

    SciTech Connect

    Thomas, D. M.; Allen, J. E.

    2015-07-15

    We investigate a cylindrical plasma system with ionization, by an annular beam of ultraviolet light, taking place only in the cylinder's outer region. In the steady state, both the outer and inner regions contain a plasma, with that in the inner region being uniform and field-free. At the interface between the two regions, there is an infinitesimal jump in ion density, the magnitude approaching zero in the quasi-neutral (λ{sub D} → 0) limit. The system offers the possibility of producing a uniform stationary plasma in the laboratory, hitherto obtained only with thermally produced alkali plasmas.

  12. Fabrication of Thiol-Ene "Clickable" Copolymer-Brush Nanostructures on Polymeric Substrates via Extreme Ultraviolet Interference Lithography.

    PubMed

    Dübner, Matthias; Gevrek, Tugce N; Sanyal, Amitav; Spencer, Nicholas D; Padeste, Celestino

    2015-06-01

    We demonstrate a new approach to grafting thiol-reactive nanopatterned copolymer-brush structures on polymeric substrates by means of extreme ultraviolet (EUV) interference lithography. The copolymer brushes were designed to contain maleimide functional groups as thiol-reactive centers. Fluoropolymer films were exposed to EUV radiation at the X-ray interference lithography beamline (XIL-II) at the Swiss Light Source, in order to create radical patterns on their surfaces. The radicals served as initiators for the copolymerization of thiol-ene "clickable" brushes, composed of a furan-protected maleimide monomer (FuMaMA) and different methacrylates, namely, methyl methacrylate (MMA), ethylene glycol methyl ether methacrylate (EGMA), or poly(ethylene glycol) methyl ether methacrylate (PEGMA). Copolymerization with ethylene-glycol-containing monomers provides antibiofouling properties to these surfaces. The number of reactive centers on the grafted brush structures can be tailored by varying the monomer ratios in the feed. Grafted copolymers were characterized by using attenuated total reflection infrared (ATR-IR) spectroscopy. The reactive maleimide methacrylate (MaMA) units were utilized to conjugate thiol-containing moieties using the nucleophilic Michael-addition reaction, which proceeds at room temperature without the need for any metal-based catalyst. Using this approach, a variety of functionalities was introduced to yield polyelectrolytes, as well as fluorescent and light-responsive polymer-brush structures. Functionalization of the brush structures was demonstrated via ATR-IR and UV-vis spectroscopy and fluorescence microscopy, and was also indicated by a color switch. Furthermore, grafted surfaces were generated via plasma activation, showing a strongly increased wettability for polyelectrolytes and a reversible switch in static water contact angle (CA) of up to 18° for P(EGMA-co-MaMA-SP) brushes, upon exposure to alternating visible and UV-light irradiation

  13. Effect of thermalization distance on stochastic phenomena in 7-nm-half-pitch line-and-space pattern fabrication using chemically amplified extreme ultraviolet resists

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2016-02-01

    The thermalization of secondary electrons is an important process in the radiation effects on a condensed matter. In the lithography using ionizing radiations, it is expected that the effects of thermalization distance will become prominent in the sub-10 nm resolution region. In this study, the effects of thermalization distance on the stochastic phenomena in the fabrication of line-and-space patterns with 7 nm half-pitch were investigated on the basis of the sensitization mechanisms of chemically amplified extreme ultraviolet resists. All three factors related to the stochastic phenomena [the stochastic generation of pinching and bridges and line edge roughness (LER)] were improved by decreasing the thermalization distance. It was found that the suppression of LER and bridge generation was a more serious problem than that of pinching.

  14. New Solar Extreme-Ultraviolet and Soft X-ray Measurements: Model Comparisons with Thermosphere and Ionosphere Observations

    NASA Astrophysics Data System (ADS)

    Solomon, S. C.; Bailey, S. M.; Christensen, A. B.; Eparvier, F. G.; Gladstone, G. R.; Paxton, L. J.; Wolven, B. C.; Woods, T. N.

    2002-05-01

    The Solar EUV Experiment (SEE) on the Thermosphere-Ionosphere-Mesosphere Energetics and Dynamics (TIMED) spacecraft is performing the first comprehensive measurements of the extreme-ultraviolet and soft X-ray region of the solar spectrum since the end of the Atmosphere Explorer (AE) mission in 1981. Comparison of TIMED/SEE measurements to contemporaneous satellite observations and a calibration rocket shows that solar irradiance in the soft X-ray and hard EUV spectral ranges, from about 2 to 25 nm, is much more intense than the AE-era observations. Using these new results as inputs to thermosphere/ionosphere models causes revisions to predicted photoelectron fluxes, ionization rates, electron density, ion composition, odd-nitrogen composition, and airglow emission rates. We compare predictions to measurements for some of these, including ground based measurements of ionospheric parameters during the first phase of the TIMED mission and far-ultraviolet dayglow limb profiles measured by the GUVI instrument.

  15. Observation of extreme ultraviolet transitions in highly charged Ba16+ to Ba23+ ions with electron beam ion trap

    NASA Astrophysics Data System (ADS)

    Ali, S.; Shimizu, E.; Nakamura, N.

    2016-03-01

    We have investigated extreme ultraviolet emission from highly charged barium using a compact electron beam ion trap at the Tokyo EBIT laboratory. The spectra were recorded for several beam energies ranging from 440 to 740 eV, while keeping the electron beam current constant at 10 mA. Radiation from charge states Zr-like Ba16+ to As-like Ba23+ were recorded and identified by varying the electron beam energy across the ionization thresholds and comparing with calculated results. The calculations were performed with a detailed relativistic configuration interaction approach using the Flexible Atomic Code. Several new lines belonging to electric dipole transitions were observed and identified.

  16. Development of a collective Thomson scattering system for laser-produced tin plasmas for extreme-ultraviolet light sources

    NASA Astrophysics Data System (ADS)

    Tomita, Kentaro; Sato, Yuta; Nishikawa, Kazutaka; Uchino, Kiichiro; Yanagida, Tatsuya; Tomuro, Hiroaki; Wada, Yasunori; Kunishima, Masahito; Kodama, Takeshi; Mizoguchi, Hakaru; Sunahara, Atsushi

    2015-12-01

    Spatial profiles of electron density (ne) and electron temperature (Te) of laser-produced Sn plasmas for extreme-ultraviolet (EUV) light sources have been obtained using a new collective Thomson scattering system, which has been optimized for the measurement of the ion feature spectrum. The system has an 18 pm spectral resolution, a 5 ns temporal resolution, a 50 µm spatial resolution, and sufficient stray-light rejection near the probing laser wavelength. With this system, measurements of the laser-produced Sn plasmas in the parameter ranges of 3 × 1023 < ne < 1025 m-3 and 10 < Te < 20 eV have been performed.

  17. Spatio-temporal coherence of free-electron laser radiation in the extreme ultraviolet determined by a Michelson interferometer

    SciTech Connect

    Hilbert, V.; Rödel, C.; Zastrau, U.; Brenner, G.; Düsterer, S.; Dziarzhytski, S.; Harmand, M.; Przystawik, A.; Redlin, H.; Toleikis, S.; Döppner, T.; Ma, T.; Fletcher, L.; Förster, E.; Glenzer, S. H.; Lee, H. J.; Hartley, N. J.; Kazak, L.; Komar, D.; Skruszewicz, S.; and others

    2014-09-08

    A key feature of extreme ultraviolet (XUV) radiation from free-electron lasers (FELs) is its spatial and temporal coherence. We measured the spatio-temporal coherence properties of monochromatized FEL pulses at 13.5 nm using a Michelson interferometer. A temporal coherence time of (59±8) fs has been determined, which is in good agreement with the spectral bandwidth given by the monochromator. Moreover, the spatial coherence in vertical direction amounts to about 15% of the beam diameter and about 12% in horizontal direction. The feasibility of measuring spatio-temporal coherence properties of XUV FEL radiation using interferometric techniques advances machine operation and experimental studies significantly.

  18. Reflectance measurements and optical constants in the extreme ultraviolet of thin films of ion-beam-deposited carbon

    NASA Astrophysics Data System (ADS)

    Larruquert, Juan I.; Keski-Kuha, Ritva A. M.

    2000-09-01

    Reflectance measurements of ion-beam-deposited (IBD) C films were performed in the extreme ultraviolet (EUV) spectral region from 49 to 200 nm. Near normal incidence reflectance of IBD C films was determined to be higher than that of evaporated C films but lower than that of diamond. Optical constants of IBD C films were obtained from reflectance measurements as a function of the angle of incidence in the spectral range 49.0-121.6 nm. The relatively high reflectance of IBD C films in the spectral region 49-92 nm and its stability when stored in a desiccator make it an interesting coating material for the EUV.

  19. Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source.

    PubMed

    Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

    2007-03-01

    A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 microm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2 x 10(11) Wcm(2) with a spot diameter of 175 microm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal. PMID:17411231

  20. Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source

    NASA Astrophysics Data System (ADS)

    Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

    2007-03-01

    A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 μm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2×1011 W/cm2 with a spot diameter of 175 μm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal.

  1. The Laser-assisted photoelectric effect of He, Ne, Ar and Xe in intense extreme ultraviolet and infrared laser fields

    NASA Astrophysics Data System (ADS)

    Hayden, P.; Dardis, J.; Hough, P.; Richardson, V.; Kennedy, E. T.; Costello, J. T.; Düsterer, S.; Redlin, H.; Feldhaus, J.; Li, W. B.; Cubaynes, D.; Meyer, M.

    2016-02-01

    In this paper, we report results on two-colour above-threshold ionisation, where extreme ultraviolet pulses of femtosecond duration were synchronised to intense infrared laser pulses of picosecond duration, in order to study the laser-assisted photoelectric effect of atomic helium, neon, krypton and xenon which leads to the appearance of characteristic sidebands in the photoelectron spectra. The observed trends are found to be well described by a simple model based on the soft-photon approximation, at least for the relatively low optical intensities of up to ? employed in these early experiments.

  2. Polarization effects in two-photon nonresonant ionization of argon with extreme-ultraviolet and infrared femtosecond pulses

    SciTech Connect

    O'Keeffe, P.; Lopez-Martens, R.; Mauritsson, J.; Johansson, A.; L'Huillier, A.; Veniard, V.; Taieeb, R.; Maquet, A.; Meyer, M.

    2004-05-01

    We report the results of experimental and theoretical investigations of the two-color, two-photon ionization of Ar atoms, using femtosecond pulses of infrared laser radiation in combination with its extreme-ultraviolet harmonics. It is shown that the intensities of the photoelectron lines resulting from the absorption of photons from both fields strongly depend both on the respective phases of the fields and on atomic quantities such as the asymmetry parameter. These phases, which are notoriously difficult to measure, can be estimated by changing the polarization state of the laser radiation.

  3. The extreme ultraviolet split and femtosecond delay unit at the plane grating monochromator beamline PG2 at FLASH

    SciTech Connect

    Sorgenfrei, F.; Schlotter, W. F.; Beeck, T.; Nagasono, M.; Gieschen, S.; Meyer, H.; Foehlisch, A.; Beye, M.; Wurth, W.

    2010-04-15

    An extreme ultraviolet split and femtosecond delay unit based on grazing incidence Mach-Zehnder geometry has been designed and implemented on the plane grating monochromator beamline PG2 at FLASH, the Free Electron Laser at DESY. This device splits the FLASH radiation into two beams, which can independently be steered, filtered and temporally delayed between -5.1 and +5.1 ps with uncertainty in the temporal accuracy of 210 as. To demonstrate the performance of this device, we have performed longitudinal coherence studies of FLASH radiation as well as measured the pulse length by nonlinear two-photon double-ionization in helium.

  4. The extreme ultraviolet split and femtosecond delay unit at the plane grating monochromator beamline PG2 at FLASH.

    PubMed

    Sorgenfrei, F; Schlotter, W F; Beeck, T; Nagasono, M; Gieschen, S; Meyer, H; Föhlisch, A; Beye, M; Wurth, W

    2010-04-01

    An extreme ultraviolet split and femtosecond delay unit based on grazing incidence Mach-Zehnder geometry has been designed and implemented on the plane grating monochromator beamline PG2 at FLASH, the Free Electron Laser at DESY. This device splits the FLASH radiation into two beams, which can independently be steered, filtered and temporally delayed between -5.1 and +5.1 ps with uncertainty in the temporal accuracy of 210 as. To demonstrate the performance of this device, we have performed longitudinal coherence studies of FLASH radiation as well as measured the pulse length by nonlinear two-photon double-ionization in helium. PMID:20441325

  5. Broadband extreme ultraviolet multilayer mirror for supercontinuum light at a photon energy of 35-65 eV

    SciTech Connect

    Hatayama, Masatoshi; Takenaka, Hisataka; Gullikson, Eric M.; Suda, Akira; Midorikawa, Katsumi

    2009-10-10

    We have developed a broadband multilayer mirror for photon energies between 35 and 65 eV. This extreme ultraviolet (EUV) mirror has an almost flat reflectivity profile at normal incidence, and the average reflectivity is 8%. The bandwidth of this mirror is 30 eV centered around 50 eV, 1.5 times broader than conventional multilayer mirrors in this energy region. This new mirror can be used in a variety of applications using supercontinuum EUV light sources including attosecond metrology.

  6. OBSERVATIONS OF FIVE-MINUTE SOLAR OSCILLATIONS IN THE CORONA USING THE EXTREME ULTRAVIOLET SPECTROPHOTOMETER (ESP) ON BOARD THE SOLAR DYNAMICS OBSERVATORY EXTREME ULTRAVIOLET VARIABILITY EXPERIMENT (SDO/EVE)

    SciTech Connect

    Didkovsky, L.; Judge, D.; Wieman, S.; Kosovichev, A. G.; Woods, T.

    2011-09-01

    We report on the detection of oscillations in the corona in the frequency range corresponding to five-minute acoustic modes of the Sun. The oscillations have been observed using soft X-ray measurements from the Extreme Ultraviolet Spectrophotometer (ESP) of the Extreme Ultraviolet Variability Experiment on board the Solar Dynamics Observatory. The ESP zeroth-order channel observes the Sun as a star without spatial resolution in the wavelength range of 0.1-7.0 nm (the energy range is 0.18-12.4 keV). The amplitude spectrum of the oscillations calculated from six-day time series shows a significant increase in the frequency range of 2-4 mHz. We interpret this increase as a response of the corona to solar acoustic (p) modes and attempt to identify p-mode frequencies among the strongest peaks. Due to strong variability of the amplitudes and frequencies of the five-minute oscillations in the corona, we study how the spectrum from two adjacent six-day time series combined together affects the number of peaks associated with the p-mode frequencies and their amplitudes. This study shows that five-minute oscillations of the Sun can be observed in the corona in variations of the soft X-ray emission. Further investigations of these oscillations may improve our understanding of the interaction of the oscillation modes with the solar atmosphere, and the interior-corona coupling, in general.

  7. Near-resonant four-wave mixing of attosecond extreme-ultraviolet pulses with near-infrared pulses in neon: Detection of electronic coherences

    NASA Astrophysics Data System (ADS)

    Cao, Wei; Warrick, Erika R.; Fidler, Ashley; Leone, Stephen R.; Neumark, Daniel M.

    2016-08-01

    Coherent narrow-band extreme-ultraviolet (EUV) light is generated by a near-resonant four-wave mixing (FWM) process between attosecond pulse trains and near-infrared pulses in neon gas. The near-resonant FWM process involves one vacuum-ultraviolet (VUV) photon and two near-infrared (NIR) photons and produces new higher-energy frequency components corresponding to the n s /n d to ground-state (2 s22 p6) transitions in the neon atom. The EUV emission exhibits small angular divergence (2 mrad) and monotonically increasing intensity over a pressure range of 0.5-16 Torr, suggesting phase matching in the production of the narrow-bandwidth coherent EUV light. In addition, time-resolved scans of the NIR nonlinear mixing process reveal the detection of a persistent, ultrafast bound electronic wave packet based on a coherent superposition initiated by the VUV pulse in the neon atoms. This FWM process using attosecond pulses offers a means for both efficient narrow-band EUV source generation and time-resolved investigations of ultrafast dynamics.

  8. Orbiting Retrievable Far and Extreme Ultraviolet Spectrometer - Shuttle Pallet Satellite (ORFEUS-SPAS)

    NASA Technical Reports Server (NTRS)

    1993-01-01

    The objective of the ORFEUS mission is to launch a deployable/retrievable astronomical platform and obtain ultraviolet spectra for both astrophysically interesting sources and the intervening interstellar medium. Also, the IMAX cameras will obtain footage of both the Shuttle and the ORFEUS-SPAS satellite during the deployment/retrieval operations phase of the ORFEUS-SPAS mission.

  9. Charge Exchange Produced Emission of Carbon in the Iron M-shell Dominated 150-200 Å Extreme Ultraviolet Region

    NASA Astrophysics Data System (ADS)

    Lepson, Jaan K.; Beiersdorfer, Peter; Bitter, Manfred; Roquemore, A. Lane; Kaita, Robert

    2015-08-01

    We report on emission spectra in the extreme ultraviolet region 150-200 Å recorded at the National Spherical Torus Experiment (NSTX). This region is typically dominated by M-shell iron emission that is used extensively for solar observations, e.g. Hinode and the Solar Dynamics Observatory, and stellar atmospheres, e.g., the Extreme Ultraviolet Explorer (EUVE). We find that significant emission occurs from several heretofore unmeasured lines, which can persist throughout the plasma duration. We attribute these lines to emission from K-shell carbon ions (C V and C VI). Spectral modeling of collisional excitation fails to account for these lines, but modeling of charge exchange provides a good match with the observation. Our spectral model shows that the lines are formed by charge exchange of bare and hydrogenlike carbon with neutral hydrogen. The high abundance of bare and hydrogenlike carbon in the solar wind suggests that these lines may be formed in the heliosphere and may be part of the soft X-ray background. They may thus be observed by energy dispersive instruments, such as microcalorimeters.This work was supported by the DOE General Plasma Science program. Work was performed by Lawrence Livermore National Laboratory and Princeton Plasma Physics Laboratory under the auspices of the U. S. Department of Energy under Contracts DEAC52-07NA27344 and DE-AC02-09CH11466.

  10. A new absolute extreme ultraviolet image system designed for studying the radiated power of the Joint Texas Experimental Tokamak discharges.

    PubMed

    Zhang, J; Zhuang, G; Wang, Z J; Ding, Y H; Zhang, X Q; Tang, Y J

    2010-07-01

    A bolometer imaging system mounted on different toroidal and poloidal locations used for radiation observation has been developed in the Joint Texas Experimental Tokamak (J-TEXT tokamak). Three miniature pinhole AXUV16ELG (16 elements absolute extreme ultraviolet silicon photodiodes) array cameras, which are settled down in the same toroidal position but in three different poloidal places, can provide a broad viewing angle that covers the whole plasma cross-section, and hence can measure the total radiated power and provide the radiated emissive profile, while nine AXUV10EL (10 elements absolute extreme ultraviolet silicon photodiodes) array cameras are divided into three groups and will be mounted on different toroidal locations to observe the toroidal radiated power distribution. Among these detectors, one element of the AXUV16ELG array is absolutely calibrated by the synchrotron radiation source to verify the system reliability. Although there are some discrepancies between the typical responsivity given by IRD Co. and the calibrated results, it is confirmed that the discrepancies have no major effect on the final result after the simulation. The details of the system as well as observations are presented in the paper. PMID:20687724

  11. Operation of a free electron laser in the wavelength range from the extreme ultraviolet to the water window

    SciTech Connect

    Ackermann, W.; Asova, G.; Ayvazyan, V.; Azima, A.; Baboi, N.; Bahr, J.; Balandin, V.; Beutner, B.; Brandt, A.; Bolzmann, A.; Brinkmann, R.; /DESY /Dubna, JINR

    2007-01-01

    We report results on the performance of a free-electron laser operating at a wavelength of 13.7 nm where unprecedented peak and average powers for a coherent extreme-ultraviolet radiation source have been measured. In the saturation regime, the peak energy approached 170 J for individual pulses, and the average energy per pulse reached 70 J. The pulse duration was in the region of 10 fs, and peak powers of 10 GW were achieved. At a pulse repetition frequency of 700 pulses per second, the average extreme-ultraviolet power reached 20 mW. The output beam also contained a significant contribution from odd harmonics of approximately 0.6% and 0.03% for the 3rd (4.6 nm) and the 5th (2.75 nm) harmonics, respectively. At 2.75 nm the 5th harmonic of the radiation reaches deep into the water window, a wavelength range that is crucially important for the investigation of biological samples.

  12. Laboratory Measurements for Developing Reliable Diagnostics of Stellar Coronae in the Extreme Ultraviolet and Soft X-ray Spectral Regions

    NASA Astrophysics Data System (ADS)

    Lepson, J. K.

    2004-05-01

    Chandra and XMM-Newton observations have greatly expanded our knowledge of the spectral emission of stellar coronae, revealing a complexity in the extreme ultraviolet and soft x-ray bands that complements past solar observations. The new observations have highlighted various shortcomings in our understanding of the spectral emission. For example, spectra in this region have many unidentified or possibly misidentified lines. Therefore, established spectral diagnostics can be impaired by previously unrecognized line blends. We are using the Livermore electron beam ion traps to simulate this emission in the laboratory. We are producing a complete catalogue of astrophysically relevant emission lines in the extreme ultraviolet and soft x-ray regions. From this catalogue we identify lines, reassess spectral diagnostics, and develop new diagnostics. Our measurements, for example, have increased the number of lines for \\ion{S}{8}--\\ion{S}{13} from 29 to 109. Measurements of iron, argon, sulfur, silicon, and magnesium are allowing us to identify previously unassigned lines in solar and stellar spectra. Moreover, we have identified a novel magnetic field diagnostic in neon-like ions. We have also reevaluated the diagnostic utility of the \\ion{Fe}{17} 3C and 3D lines, previously considered to be a prime diagnostic of opacity, instead showing them to be of use as a diagnostic of electron temperature. Research at the University of California Lawrence Livermore National Laboratory conducted under the auspices of the Department of Energy and supported by a NASA SARA grant.

  13. Continuous-wave ultraviolet emission through fourth-harmonic generation in a whispering-gallery resonator.

    PubMed

    Moore, Jeremy; Tomes, Matthew; Carmon, Tal; Jarrahi, Mona

    2011-11-21

    We experimentally demonstrate continuous-wave ultraviolet emission through forth-harmonic generation in a millimeter-scale lithium niobate whispering-gallery resonator pumped with a telecommunication-compatible infrared source. The whispering-gallery resonator provides four spectral lines at ultraviolet, visible, near-infrared and infrared, which are equally spaced in frequency via the cascaded-harmonic process and span a 2-octave frequency band. Our technique relies on a variable crystal poling and high transverse order of the modes for phase-matching and a resonator quality factor of over 10(7) to allow cascaded-harmonic generation up to the fourth-harmonic at input pump powers as low as 200 mW. The compact size of the whispering gallery resonator pumped at telecommunication-compatible infrared wavelengths and the low pump power requirement make our device a promising ultraviolet light source for information storage, microscopy, and chemical analysis. PMID:22109440

  14. Study on stochastic phenomena induced in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist (high performance model resist for extreme ultraviolet lithography)

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Santillan, Julius J.; Itani, Toshiro

    2016-03-01

    Understanding of stochastic phenomena is essential to the development of highly sensitive resist for nanofabrication. In this study, we investigated the stochastic effects in a chemically amplified resist consisting of poly(4-hydroxystyrene-co-t-butyl methacrylate), triphenylsulfonium nonafluorobutanesulfonate (an acid generator), and tri-n-octylamine (a quencher). The SEM images of resist patterns were analyzed, using Monte Carlo simulation on the basis of the sensitization and reaction mechanisms of chemically amplified extreme ultraviolet resists. It was estimated that +/-0.82σ fluctuation of the number of protected units per polymer molecule led to line edge roughness formation. Here, σ is the standard deviation of the number of protected units per polymer molecule after postexposure baking.

  15. Harmonium: A pulse preserving source of monochromatic extreme ultraviolet (30–110 eV) radiation for ultrafast photoelectron spectroscopy of liquids

    PubMed Central

    Ojeda, J.; Arrell, C. A.; Grilj, J.; Frassetto, F.; Mewes, L.; Zhang, H.; van Mourik, F.; Poletto, L.; Chergui, M.

    2015-01-01

    A tuneable repetition rate extreme ultraviolet source (Harmonium) for time resolved photoelectron spectroscopy of liquids is presented. High harmonic generation produces 30–110 eV photons, with fluxes ranging from ∼2 × 1011 photons/s at 36 eV to ∼2 × 108 photons/s at 100 eV. Four different gratings in a time-preserving grating monochromator provide either high energy resolution (0.2 eV) or high temporal resolution (40 fs) between 30 and 110 eV. Laser assisted photoemission was used to measure the temporal response of the system. Vibrational progressions in gas phase water were measured demonstrating the ∼0.2 eV energy resolution. PMID:26798833

  16. The Effects of Oxygen Plasma on the Chemical Composition and Morphology of the Ru Capping Layer of the Extreme Ultraviolet (EUV) Mask Blanks

    SciTech Connect

    Belau, Leonid; Park, Jeong Y.; Liang, Ted; Somorjai, Gabor A.

    2008-06-07

    Contamination removal from extreme ultraviolet (EUV) mask surfaces is one of the most important aspects to improve reliability for the next generation of EUV lithography. We report chemical and morphological changes of the ruthenium (Ru) mask surface after oxygen plasma treatment using surface sensitive analytical methods: X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and transmission electron microscopy (TEM). Chemical analysis of the EUV masks shows an increase in the subsurface oxygen concentration, Ru oxidation and surface roughness. XPS spectra at various photoelectron takeoff angles suggest that the EUV mask surface was covered with chemisorbed oxygen after oxygen plasma treatment. It is proposed that the Kirkendall effect is the most plausible mechanism that explains the Ru surface oxidation. The etching rate of the Ru capping layer by oxygen plasma was estimated to be 1.5 {+-} 0.2 {angstrom}/min, based on TEM cross sectional analysis.

  17. Harmonium: A pulse preserving source of monochromatic extreme ultraviolet (30-110 eV) radiation for ultrafast photoelectron spectroscopy of liquids.

    PubMed

    Ojeda, J; Arrell, C A; Grilj, J; Frassetto, F; Mewes, L; Zhang, H; van Mourik, F; Poletto, L; Chergui, M

    2016-03-01

    A tuneable repetition rate extreme ultraviolet source (Harmonium) for time resolved photoelectron spectroscopy of liquids is presented. High harmonic generation produces 30-110 eV photons, with fluxes ranging from ∼2 × 10(11) photons/s at 36 eV to ∼2 × 10(8) photons/s at 100 eV. Four different gratings in a time-preserving grating monochromator provide either high energy resolution (0.2 eV) or high temporal resolution (40 fs) between 30 and 110 eV. Laser assisted photoemission was used to measure the temporal response of the system. Vibrational progressions in gas phase water were measured demonstrating the ∼0.2 eV energy resolution. PMID:26798833

  18. Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation

    NASA Astrophysics Data System (ADS)

    Fukasawa, Masanaga; Miyawaki, Yudai; Kondo, Yusuke; Takeda, Keigo; Kondo, Hiroki; Ishikawa, Kenji; Sekine, Makoto; Matsugai, Hiroyasu; Honda, Takayoshi; Minami, Masaki; Uesawa, Fumikatsu; Hori, Masaru; Tatsumi, Tetsuya

    2012-02-01

    Photon-enhanced etching of SiNx:H films caused by the interaction between vacuum ultraviolet (VUV)/ultraviolet (UV) radiation and radicals in the fluorocarbon plasma was investigated by a technique with a novel sample setup of the pallet for plasma evaluation. The simultaneous injection of UV radiation and radicals causes a dramatic etch rate enhancement of SiNx:H films. Only UV radiation causes the film shrinkage of SiNx:H films owing to hydrogen desorption from the film. Capacitance-voltage characteristics of SiNx:H/Si substrates were studied before and after UV radiation. The interface trap density increased monotonically upon irradiating the UV photons with a wavelength of 248 nm. The estimated effective interface trap generation probability is 4.74 ×10-7 eV-1·photon-1. Therefore, the monitoring of the VUV/UV spectra during plasma processing and the understanding of its impact on the surface reaction, film damage and electrical performance of underlying devices are indispensable to fabricate advanced devices.

  19. Wavelength Shifting Efficiency of Tetraphenyl Butadiene (TPB) at Extreme Ultraviolet Wavelengths

    NASA Astrophysics Data System (ADS)

    Benson, Christopher; Orebi Gann, Gabriel; Gehman, Victor

    2015-10-01

    Tetraphenyl Butadiene (TPB) is a commonly used wavelength shifter (WLS) in neutrino and dark matter liquid noble gas scintillator detectors. Thin films of wavelength shifters are used to shift ultraviolet scintillation light into the visible spectrum for event reconstruction. The wavelength shifting efficiency of TPB is a function of the incident ultraviolet photon wavelength and is an important parameter for detector design, simulation and reconstruction. The wavelength shifting efficiency and emission spectrum has been previously measured down to 120 nm [Gehman et al., 2011]. To build liquid noble gas scintillator detectors with lighter elements (Ne, He) that use TPB as a WLS medium, the wavelength shifting efficiency must be known closer to 80 nm. This talk will present the current status and preliminary results from a set of measurements that will improve the precision of the efficiency of 120 nm, and extend the data to wavelengths as low as 45 nm.

  20. PHz-wide supercontinua of nondispersing subcycle pulses generated by extreme modulational instability.

    PubMed

    Tani, F; Travers, J C; Russell, P St J

    2013-07-19

    Modulational instability (MI) of 500 fs, 5 μJ pulses, propagating in gas-filled hollow-core kagome photonic crystal fiber, is studied numerically and experimentally. By tuning the pressure and launched energy, we control the duration of the pulses emerging as a consequence of MI and hence are able to study two regimes: the classical MI case leading to few-cycle solitons of the nonlinear Schrödinger equation; and an extreme case leading to the formation of nondispersing subcycle pulses (0.5 to 2 fs) with peak intensities of order 10(14) W cm(-2). Insight into the two regimes is obtained using a novel statistical analysis of the soliton parameters. Numerical simulations and experimental measurements show that, when a train of these pulses is generated, strong ionization of the gas occurs. This extreme MI is used to experimentally generate a high energy (>1 μJ) and spectrally broad supercontinuum extending from the deep ultraviolet (320 nm) to the infrared (1300 nm). PMID:23909325