Science.gov

Sample records for extreme ultraviolet generation

  1. Generation of extreme ultraviolet vortex beams using computer generated holograms.

    PubMed

    Terhalle, Bernd; Langner, Andreas; Päivänranta, Birgit; Guzenko, Vitaliy A; David, Christian; Ekinci, Yasin

    2011-11-01

    We fabricate computer generated holograms for the generation of phase singularities at extreme ultraviolet (EUV) wavelengths using electron beam lithography and demonstrate their ability to generate optical vortices in the nonzero diffraction orders. To this end, we observe the characteristic intensity distribution of the vortex beam and verify the helical phase structure interferometrically. The presented method forms the basis for further studies on singular light fields in the EUV frequency range, i.e., in EUV interference lithography. Since the method is purely achromatic, it may also find applications in various fields of x ray optics. PMID:22048345

  2. Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography

    DOEpatents

    Hassanein, Ahmed; Konkashbaev, Isak

    2006-10-03

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.

  3. Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

    SciTech Connect

    Medvedev, V. V. Kruijs, R. W. E. van de; Yakshin, A. E.; Novikova, N. N.; Krivtsun, V. M.; Louis, E.; Bijkerk, F.; Yakunin, A. M.

    2013-11-25

    We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO{sub 2} laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.

  4. Attosecond extreme ultraviolet generation in cluster by using spatially inhomogeneous field

    SciTech Connect

    Feng, Liqiang; Liu, Hang

    2015-01-15

    A promising method to generate the attosecond extreme ultraviolet (XUV) sources has been theoretically investigated emerging from the two-dimensional Ar{sup +} cluster driven by the spatially inhomogeneous field. The results show that with the introduction of the Ar{sup +} cluster model, not only the harmonic cutoffs are enhanced, but also the harmonic yields are reinforced. Furthermore, by properly moderating the inhomogeneity as well as the laser parameters of the inhomogeneous field, the harmonic cutoff can be further extended. As a result, three almost linearly polarized XUV pulses with durations of 40 as, 42 as, and 45 as can be obtained.

  5. Spin-on-glass coatings for the generation of super-polishedsubstrates for extreme ultraviolet optics

    SciTech Connect

    Salmassi, Farhad; Naulleau, Patrick P.; Gullikson, Eric M.

    2005-01-01

    Substrates intended for use as extreme ultraviolet (EUV) optics have extremely stringent requirements in terms of finish. These requirements can dramatically increase the cost and fabrication time, especially when non-conventional shapes, such as toroids, are required. Here we present a spin-on-glass resist process capable of generating super-polished parts from inexpensive substrates. The method has been used to render diamond-turned substrates compatible for use as EUV optics. Toroidal diamond-turned optics with starting rms roughness in the 3.3 to 3.7 nm range have been smoothed to the 0.4 to 0.6 nm range. EUV reflectometry characterization of these optics has demonstrated reflectivities of approximately 63%.

  6. Extreme ultraviolet emission from dense plasmas generated with sub-10-fs laser pulses

    SciTech Connect

    Osterholz, J.; Brandl, F.; Cerchez, M.; Fischer, T.; Hemmers, D.; Hidding, B.; Pipahl, A.; Pretzler, G.; Willi, O.; Rose, S. J.

    2008-10-15

    The extreme ultraviolet (XUV) emission from dense plasmas generated with sub-10-fs laser pulses with varying peak intensities up to 3x10{sup 16} W/cm{sup 2} is investigated for different target materials. K shell spectra are obtained from low Z targets (carbon and boron nitride). In the spectra, a series limit for the hydrogen- and helium-like resonance lines is observed, indicating that the plasma is at high density and that pressure ionization has removed the higher levels. In addition, L shell spectra from titanium targets were obtained. Basic features of the K and L shell spectra are reproduced with computer simulations. The calculations include hydrodynamic simulation of the plasma expansion and collisional radiative calculations of the XUV emission.

  7. Extreme ultraviolet lithography machine

    DOEpatents

    Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

    2000-01-01

    An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  8. Extreme-Ultraviolet-Initated High-Order Harmonic Generation: Driving Inner-Valence Electrons Using Below-Threshold-Energy Extreme-Ultraviolet Light.

    PubMed

    Brown, A C; van der Hart, H W

    2016-08-26

    We propose a novel scheme for resolving the contribution of inner- and outer-valence electrons in extreme-ultraviolet (XUV)-initiated high-harmonic generation in neon. By probing the atom with a low-energy (below the 2s ionization threshold) ultrashort XUV pulse, the 2p electron is steered away from the core, while the 2s electron is enabled to describe recollision trajectories. By selectively suppressing the 2p recollision trajectories, we can resolve the contribution of the 2s electron to the high-harmonic spectrum. We apply the classical trajectory model to account for the contribution of the 2s electron, which allows for an intuitive understanding of the process. PMID:27610852

  9. Extreme ultraviolet source using a forced recombination process in lithium plasma generated by a pulsed laser

    NASA Astrophysics Data System (ADS)

    Nagano, Akihisa; Inoue, Takahiro; Nica, Petru-Edward; Amano, Sho; Miyamoto, Shuji; Mochizuki, Takayasu

    2007-04-01

    An extreme ultraviolet source having a tamper has been studied. This target scheme recombines forcedly lithium ions by low temperature electrons from the tamper, converting Li3+ rapidly to excited Li2+ which emit intense 1s-2p Lyman α emissions at 13.5nm. A strong 13.5nm emission appeared at 20-30ns after the time of laser peak within a small space volume near the tamper. The authors obtained an enhancement of extreme ultraviolet conversion efficiency by a factor of about 2 with the tamper against that of a target without the tamper at the same laser irradiation condition.

  10. Characterization of material ablation driven by laser generated intense extreme ultraviolet light

    NASA Astrophysics Data System (ADS)

    Tanaka, Nozomi; Masuda, Masaya; Deguchi, Ryo; Murakami, Masakatsu; Sunahara, Atsushi; Fujioka, Shinsuke; Yogo, Akifumi; Nishimura, Hiroaki

    2015-09-01

    We present a comparative study on the hydrodynamic behaviour of plasmas generated by material ablation by the irradiation of nanosecond extreme ultraviolet (EUV or XUV) or infrared laser pulses on solid samples. It was clarified that the difference in the photon energy deposition and following material heating mechanism between these two lights result in the difference in the plasma parameters and plasma expansion characteristics. Silicon plate was ablated by either focused intense EUV pulse (λ = 9-25 nm, 10 ns) or laser pulse (λ = 1064 nm, 10 ns), both with an intensity of ˜109 W/cm2. Both the angular distributions and energy spectra of the expanding ions revealed that the photoionized plasma generated by the EUV light differs significantly from that produced by the laser. The laser-generated plasma undergoes spherical expansion, whereas the EUV-generated plasma undergoes planar expansion in a comparatively narrow angular range. It is presumed that the EUV radiation is transmitted through the expanding plasma and directly photoionizes the samples in the solid phase, consequently forming a high-density and high-pressure plasma. Due to a steep pressure gradient along the direction of the target normal, the EUV plasma expands straightforward resulting in the narrower angular distribution observed.

  11. Characterization of material ablation driven by laser generated intense extreme ultraviolet light

    SciTech Connect

    Tanaka, Nozomi Masuda, Masaya; Deguchi, Ryo; Murakami, Masakatsu; Fujioka, Shinsuke; Yogo, Akifumi; Nishimura, Hiroaki; Sunahara, Atsushi

    2015-09-14

    We present a comparative study on the hydrodynamic behaviour of plasmas generated by material ablation by the irradiation of nanosecond extreme ultraviolet (EUV or XUV) or infrared laser pulses on solid samples. It was clarified that the difference in the photon energy deposition and following material heating mechanism between these two lights result in the difference in the plasma parameters and plasma expansion characteristics. Silicon plate was ablated by either focused intense EUV pulse (λ = 9–25 nm, 10 ns) or laser pulse (λ = 1064 nm, 10 ns), both with an intensity of ∼10{sup 9 }W/cm{sup 2}. Both the angular distributions and energy spectra of the expanding ions revealed that the photoionized plasma generated by the EUV light differs significantly from that produced by the laser. The laser-generated plasma undergoes spherical expansion, whereas the EUV-generated plasma undergoes planar expansion in a comparatively narrow angular range. It is presumed that the EUV radiation is transmitted through the expanding plasma and directly photoionizes the samples in the solid phase, consequently forming a high-density and high-pressure plasma. Due to a steep pressure gradient along the direction of the target normal, the EUV plasma expands straightforward resulting in the narrower angular distribution observed.

  12. Optimum concentration ratio of photodecomposable quencher to acid generator in chemically amplified extreme ultraviolet resists

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro

    2015-12-01

    In chemically amplified resists used for ionizing radiations such as an extreme ultraviolet radiation, thermalized electrons and protons play important roles in pattern formation. Photodecomposable quenchers are important for 11 nm half-pitch fabrication because they capture both thermalized electrons and protons. However, their effects are complicated for the same reason. In this study, the optimum concentration ratio of photodecomposable quenchers to acid generators in terms of the trade-off relationships between resolution, line width roughness (LWR), and sensitivity was theoretically investigated, assuming line-and-space patterns of 11 nm half-pitch. To suppress LWR to less than 20% critical dimension (CD), the recommended total sensitizer concentration (the sum of acid generator and photodecomposable quencher concentrations) was in the range of 0.20-0.22 nm-3. The expected sensitivities were 30-40 mJ cm-2 when the resist performance of the latest chemically amplified resists was assumed. The optimum ratio of photodecomposable quencher concentration to the total sensitizer concentration was 0.55.

  13. Spectroscopic measurements of ablation plasma generated with laser-driven intense extreme ultraviolet (EUV) light

    NASA Astrophysics Data System (ADS)

    Tanaka, N.; Hane, K.; Shikata, H.; Masuda, M.; Nagatomi, K.; Sunahara, A.; Yoshida, M.; Fujioka, S.; Nishimura, H.

    2016-03-01

    Material ablation by a focused Extreme ultraviolet (EUV) light is studied by comparing expanding ion properties and plasma parameters with laser ablation. The kinetic energy distributions of expanding ions from EUV and laser ablation showed different spectra implying different geometries of plasma expansion. The calculation results of plasma parameters showed that EUV energy is mostly deposited in high electron density region close to the solid density, while laser energy is deposited in low energy density region. Plasma parameters experimentally obtained from visible spectra did not show noticeable difference between EUV and laser ablation due to the corresponding low cut off density.

  14. Generation of high-resolution kagome lattice structures using extreme ultraviolet interference lithography

    NASA Astrophysics Data System (ADS)

    Wang, Li; Terhalle, Bernd; Guzenko, Vitaliy A.; Farhan, Alan; Hojeij, Mohamad; Ekinci, Yasin

    2012-08-01

    High-resolution kagome lattice structures with feature sizes down to the sub-50 nm regime are fabricated using diffraction-based extreme ultraviolet interference lithography. The resulting interference pattern of multiple beams is sensitive to the relative phase of the interfering beams. The precise control of their phases is achieved by precise positioning of transmission diffraction gratings on a mask using a high-end electron beam lithography tool. The presented method may find applications in providing high-resolution and large-area kagome lattice structures for studies on frustrated magnetic systems, photonic crystals, and plasmonics.

  15. Generation of bright phase-matched circularly-polarized extreme ultraviolet high harmonics

    NASA Astrophysics Data System (ADS)

    Kfir, Ofer; Grychtol, Patrik; Turgut, Emrah; Knut, Ronny; Zusin, Dmitriy; Popmintchev, Dimitar; Popmintchev, Tenio; Nembach, Hans; Shaw, Justin M.; Fleischer, Avner; Kapteyn, Henry; Murnane, Margaret; Cohen, Oren

    2015-02-01

    Circularly-polarized extreme ultraviolet and X-ray radiation is useful for analysing the structural, electronic and magnetic properties of materials. To date, such radiation has only been available at large-scale X-ray facilities such as synchrotrons. Here, we demonstrate the first bright, phase-matched, extreme ultraviolet circularly-polarized high harmonics source. The harmonics are emitted when bi-chromatic counter-rotating circularly-polarized laser pulses field-ionize a gas in a hollow-core waveguide. We use this new light source for magnetic circular dichroism measurements at the M-shell absorption edges of Co. We show that phase-matching of circularly-polarized harmonics is unique and robust, producing a photon flux comparable to linearly polarized high harmonic sources. This work represents a critical advance towards the development of table-top systems for element-specific imaging and spectroscopy of multiple elements simultaneously in magnetic and other chiral media with very high spatial and temporal resolution.

  16. Spin-resolved photoelectron spectroscopy using femtosecond extreme ultraviolet light pulses from high-order harmonic generation.

    PubMed

    Plötzing, M; Adam, R; Weier, C; Plucinski, L; Eich, S; Emmerich, S; Rollinger, M; Aeschlimann, M; Mathias, S; Schneider, C M

    2016-04-01

    The fundamental mechanism responsible for optically induced magnetization dynamics in ferromagnetic thin films has been under intense debate since almost two decades. Currently, numerous competing theoretical models are in strong need for a decisive experimental confirmation such as monitoring the triggered changes in the spin-dependent band structure on ultrashort time scales. Our approach explores the possibility of observing femtosecond band structure dynamics by giving access to extended parts of the Brillouin zone in a simultaneously time-, energy- and spin-resolved photoemission experiment. For this purpose, our setup uses a state-of-the-art, highly efficient spin detector and ultrashort, extreme ultraviolet light pulses created by laser-based high-order harmonic generation. In this paper, we present the setup and first spin-resolved spectra obtained with our experiment within an acquisition time short enough to allow pump-probe studies. Further, we characterize the influence of the excitation with femtosecond extreme ultraviolet pulses by comparing the results with data acquired using a continuous wave light source with similar photon energy. In addition, changes in the spectra induced by vacuum space-charge effects due to both the extreme ultraviolet probe- and near-infrared pump-pulses are studied by analyzing the resulting spectral distortions. The combination of energy resolution and electron count rate achieved in our setup confirms its suitability for spin-resolved studies of the band structure on ultrashort time scales. PMID:27131684

  17. Spin-resolved photoelectron spectroscopy using femtosecond extreme ultraviolet light pulses from high-order harmonic generation

    NASA Astrophysics Data System (ADS)

    Plötzing, M.; Adam, R.; Weier, C.; Plucinski, L.; Eich, S.; Emmerich, S.; Rollinger, M.; Aeschlimann, M.; Mathias, S.; Schneider, C. M.

    2016-04-01

    The fundamental mechanism responsible for optically induced magnetization dynamics in ferromagnetic thin films has been under intense debate since almost two decades. Currently, numerous competing theoretical models are in strong need for a decisive experimental confirmation such as monitoring the triggered changes in the spin-dependent band structure on ultrashort time scales. Our approach explores the possibility of observing femtosecond band structure dynamics by giving access to extended parts of the Brillouin zone in a simultaneously time-, energy- and spin-resolved photoemission experiment. For this purpose, our setup uses a state-of-the-art, highly efficient spin detector and ultrashort, extreme ultraviolet light pulses created by laser-based high-order harmonic generation. In this paper, we present the setup and first spin-resolved spectra obtained with our experiment within an acquisition time short enough to allow pump-probe studies. Further, we characterize the influence of the excitation with femtosecond extreme ultraviolet pulses by comparing the results with data acquired using a continuous wave light source with similar photon energy. In addition, changes in the spectra induced by vacuum space-charge effects due to both the extreme ultraviolet probe- and near-infrared pump-pulses are studied by analyzing the resulting spectral distortions. The combination of energy resolution and electron count rate achieved in our setup confirms its suitability for spin-resolved studies of the band structure on ultrashort time scales.

  18. Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources

    SciTech Connect

    Cummins, T.; O'Gorman, C.; Dunne, P.; Sokell, E.; O'Sullivan, G.; Hayden, P.

    2014-07-28

    Colliding plasmas produced by neodymium-doped yttrium aluminium garnet (Nd:YAG) laser illumination of tin wedge targets form stagnation layers, the physical parameters of which can be controlled to optimise coupling with a carbon dioxide (CO{sub 2}) heating laser pulse and subsequent extreme ultraviolet (EUV) production. The conversion efficiency (CE) of total laser energy into EUV emission at 13.5 nm ± 1% was 3.6%. Neglecting both the energy required to form the stagnation layer and the EUV light produced before the CO{sub 2} laser pulse is incident results in a CE of 5.1% of the CO{sub 2} laser energy into EUV light.

  19. Extreme ultraviolet lithography patterned mask defect detection performance evaluation toward 16- to 11-nm half-pitch generation

    NASA Astrophysics Data System (ADS)

    Hirano, Ryoichi; Iida, Susumu; Amano, Tsuyoshi; Watanabe, Hidehiro; Hatakeyama, Masahiro; Murakami, Takeshi; Yoshikawa, Shoji; Terao, Kenji

    2015-07-01

    High-sensitivity and low-noise extreme ultraviolet (EUV) mask pattern defect detection is one of the major issues remaining to be addressed in device fabrication using extreme ultraviolet lithography (EUVL). We have designed a projection electron microscopy (PEM) system, which has proven to be quite promising for half-pitch (hp) 16-nm node to hp 11-nm node mask inspection. The PEM system was integrated into a pattern inspection system for defect detection sensitivity evaluation. To improve the performance of hp 16-nm patterned mask defect detection toward hp 11-nm EUVL patterned mask, defect detection signal characteristics, which depend on hp 64-nm pattern image intensity deviation on EUVL mask, were studied. Image adjustment effect of the captured images for die-to-die defect detection was evaluated before the start of the defect detection image-processing sequence. Image correction of intrafield intensity unevenness and L/S pattern image contrast deviation suppresses the generation of false defects. Captured images of extrusion and intrusion defects in hp 64-nm L/S patterns were used for detection. Applying the image correction for defect detection, 12-nm sized intrusion defect, which was smaller than our target size for hp 16-nm defect detection requirements, was identified without false defects.

  20. Generation of an extreme ultraviolet supercontinuum and isolated sub-50 as pulse in a two-colour laser field

    NASA Astrophysics Data System (ADS)

    Zhang, Gang-Tai; Liu, Xue-Shen

    2009-06-01

    We theoretically study high-order harmonic generation when a helium ion is exposed to a two-colour laser field, which is synthesized by a 5 fs/800 nm laser pulse and a 64 fs/2400 nm laser pulse. Our numerical results show that the harmonic spectrum exhibits an ultrabroad extreme ultraviolet supercontinuum when the initial state is prepared as a coherent superposition of the ground state and the first excited state. By superposing a series of properly selected harmonics, an isolated attosecond pulse with a duration of 47 as is obtained. Compared with the case of the ground state in a one-colour field, the intensity of this isolated attosecond pulse is six orders of magnitude higher. We also demonstrate these results in terms of the time-frequency analysis and the semiclassical three-step model.

  1. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, Glenn D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  2. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    2000-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  3. The Extreme Ultraviolet Explorer mission

    NASA Technical Reports Server (NTRS)

    Welsh, Barry Y.

    1991-01-01

    The Extreme Ultraviolet Explorer (EUVE) is a NASA astronomy mission which will operate in the 70-760A spectral band. The science payload consists of three grazing incidence scanning telescopes and an EUV spectrometer/deep survey instrument. An overview of the planned mission profile is given, and the instrumentation which comprises the science payload is discussed. The EUVE is scheduled for launch in late August 1991.

  4. HELIOS—A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy

    SciTech Connect

    Plogmaker, S. E-mail: Joachim.Terschluesen@physics.uu.se Terschlüsen, J. A. E-mail: Joachim.Terschluesen@physics.uu.se Krebs, N.; Svanqvist, M.; Forsberg, J.; Cappel, U. B.; Rubensson, J.-E.; Siegbahn, H.; Söderström, J. E-mail: Joachim.Terschluesen@physics.uu.se

    2015-12-15

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20 000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ⋅ 10{sup 10} photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization.

  5. HELIOS--A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy.

    PubMed

    Plogmaker, S; Terschlüsen, J A; Krebs, N; Svanqvist, M; Forsberg, J; Cappel, U B; Rubensson, J-E; Siegbahn, H; Söderström, J

    2015-12-01

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20,000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ⋅ 10(10) photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization. PMID:26724006

  6. Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generation

    NASA Astrophysics Data System (ADS)

    Hirano, Ryoichi; Iida, Susumu; Amano, Tsuyoshi; Watanabe, Hidehiro; Hatakeyama, Masahiro; Murakami, Takeshi; Suematsu, Kenichi; Terao, Kenji

    2016-03-01

    Novel projection electron microscope optics have been developed and integrated into a new inspection system named EBEYE-V30 ("Model EBEYE" is an EBARA's model code) , and the resulting system shows promise for application to half-pitch (hp) 16-nm node extreme ultraviolet lithography (EUVL) patterned mask inspection. To improve the system's inspection throughput for 11-nm hp generation defect detection, a new electron-sensitive area image sensor with a high-speed data processing unit, a bright and stable electron source, and an image capture area deflector that operates simultaneously with the mask scanning motion have been developed. A learning system has been used for the mask inspection tool to meet the requirements of hp 11-nm node EUV patterned mask inspection. Defects are identified by the projection electron microscope system using the "defectivity" from the characteristics of the acquired image. The learning system has been developed to reduce the labor and costs associated with adjustment of the detection capability to cope with newly-defined mask defects. We describe the integration of the developed elements into the inspection tool and the verification of the designed specification. We have also verified the effectiveness of the learning system, which shows enhanced detection capability for the hp 11-nm node.

  7. High-peak-power surface high-harmonic generation at extreme ultra-violet wavelengths from a tape

    SciTech Connect

    Shaw, B. H.; Tilborg, J. van; Sokollik, T.; Schroeder, C. B.; McKinney, W. R.; Artemiev, N. A.; Yashchuk, V. V.; Gullikson, E. M.; Leemans, W. P.

    2013-07-28

    Solid-based surface high-harmonic generation from a tape is experimentally studied. By operating at mildly relativistic normalized laser strengths a{sub 0}≲0.2, harmonics up to the 17th order are efficiently produced in the coherent wake emission (CWE) regime. CWE pulse properties, such as divergence, energy, conversion efficiency, and spectrum, are investigated for various tape materials and drive laser conditions. A clear correlation between surface roughness and harmonic beam divergence is found. At the measured pulse properties for the 15th harmonic (conversion efficiency ∼6.5×10{sup −7}, divergence ∼7−15 mrad), the 100-mJ-level drive laser produces several MWs of extreme ultra-violet pulses. The spooling tape configuration enables multi-Hz operation over thousands of shots, making this source attractive as a seed to the few-Hz laser-plasma-accelerator-driven free-electron laser (FEL). Models indicate that these CWE pulses with MW level powers are sufficient for seed-induced bunching and FEL gain.

  8. Optimization of Extreme Ultraviolet Light Source from High Harmonic Generation for Condensed-Phase Core-Level Spectroscopy

    NASA Astrophysics Data System (ADS)

    Lin, Ming-Fu; Verkamp, Max A.; Ryland, Elizabeth S.; Benke, Kristin; Zhang, Kaili; Carlson, Michaela; Vura-Weis, Josh

    2015-06-01

    Extreme ultraviolet (XUV) light source from high-order harmonic generation has been shown to be a powerful tool for core-level spectroscopy. In addition, this light source provides very high temporal resolution (10-18 s to 10-15 s) for time-resolved transient absorption spectroscopy. Most applications of the light source have been limited to the studies of atomic and molecular systems, with technique development focused on optimizing for shorter pulses (i.e. tens of attoseconds) or higher XUV energy (i.e. ~keV range). For the application to general molecular systems in solid and liquid forms, however, the XUV photon flux and stability are highly demanded due to the strong absorption by substrates and solvents. In this case, the main limitation is due to the stability of the high order generation process and the limited bandwidth of the XUV source that gives only discrete even/odd order peaks. Consequently, this results in harmonic artifact noise that overlaps with the resonant signal. In our current study, we utilize a semi-infinite cell for high harmonic generation from two quantum trajectories (i.e. short and long) at over-driven NIR power. This condition, produces broad XUV spectrum without using complicated optics (e.g. hollow-core fibers and double optical gating). This light source allows us to measure the static absorption spectrum of the iron M-edge from a Fe(acac)3 molecular solid film, which shows a resonant feature of 0.01 OD (~2.3% absorption). Moreover, we also investigate how sample roughness affects the static absorption spectrum. We are able to make smooth solar cell precursor materials (i.e. PbI2 and PbBr2) by spin casting and observe iodine (50 eV) and bromine (70 eV) absorption edges in the order of 0.05 OD with minimal harmonic artifact noise.

  9. Extreme ultraviolet photoionization of aldoses and ketoses

    NASA Astrophysics Data System (ADS)

    Shin, Joong-Won; Dong, Feng; Grisham, Michael E.; Rocca, Jorge J.; Bernstein, Elliot R.

    2011-04-01

    Gas phase monosaccharides (2-deoxyribose, ribose, arabinose, xylose, lyxose, glucose galactose, fructose, and tagatose), generated by laser desorption of solid sample pellets, are ionized with extreme ultraviolet photons (EUV, 46.9 nm, 26.44 eV). The resulting fragment ions are analyzed using a time of flight mass spectrometer. All aldoses yield identical fragment ions regardless of size, and ketoses, while also generating same ions as aldoses, yields additional features. Extensive fragmentation of the monosaccharides is the result the EUV photons ionizing various inner valence orbitals. The observed fragmentation patterns are not dependent upon hydrogen bonding structure or OH group orientation.

  10. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Labov, S. E.

    1985-01-01

    Instruments designed to explore different aspects of far and extreme ultraviolet cosmic radiation were studied. The far ultraviolet imager (FUVI) was flown on the Aries sounding rocket. Its unique large format 75mm detector mapped out the far ultraviolet background radiation with a resolution of only a few arc minutes. Analysis of this data indicates to what extent the FUVI background is extra galactic in origin. A power spectrum of the spatial fluctuations will have direct consequences for galactic evolution.

  11. Masks for extreme ultraviolet lithography

    SciTech Connect

    Cardinale, G; Goldsmith, J; Kearney, P A; Larson, C; Moore, C E; Prisbrey, S; Tong, W; Vernon, S P; Weber, F; Yan, P-Y

    1998-09-01

    In extreme ultraviolet lithography (EUVL), the technology specific requirements on the mask are a direct consequence of the utilization of radiation in the spectral region between 10 and 15 nm. At these wavelengths, all condensed materials are highly absorbing and efficient radiation transport mandates the use of all-reflective optical systems. Reflectivity is achieved with resonant, wavelength-matched multilayer (ML) coatings on all of the optical surfaces - including the mask. The EUV mask has a unique architecture - it consists of a substrate with a highly reflective ML coating (the mask blank) that is subsequently over-coated with a patterned absorber layer (the mask). Particulate contamination on the EUVL mask surface, errors in absorber definition and defects in the ML coating all have the potential to print in the lithographic process. While highly developed technologies exist for repair of the absorber layer, no viable strategy for the repair of ML coating defects has been identified. In this paper the state-of-the-art in ML deposition technology, optical inspection of EUVL mask blank defects and candidate absorber patterning approaches are reviewed.

  12. Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target

    NASA Astrophysics Data System (ADS)

    Ueno, Yoshifumi; Ariga, Tatsuya; Soumagne, George; Higashiguchi, Takeshi; Kubodera, Shoichi; Pogorelsky, Igor; Pavlishin, Igor; Stolyarov, Daniil; Babzien, Marcus; Kusche, Karl; Yakimenko, Vitaly

    2007-05-01

    We demonstrated efficacy of a CO2-laser-produced xenon plasma in the extreme ultraviolet (EUV) spectral region at 13.5nm at variable laser pulse widths between 200ps and 25ns. The plasma target was a 30μm liquid xenon microjet. To ensure the optimum coupling of CO2 laser energy with the plasma, they applied a prepulse yttrium aluminum garnet laser. The authors measured the conversion efficiency (CE) of the 13.5nm EUV emission for different pulse widths of the CO2 laser. A maximum CE of 0.6% was obtained for a CO2 laser pulse width of 25ns at an intensity of 5×1010W/cm2.

  13. Astronomy and the Extreme Ultraviolet Explorer satellite

    NASA Technical Reports Server (NTRS)

    Bowyer, S.

    1994-01-01

    The extreme ultraviolet wave band (100 to 912 angstroms) was thought until recently to be useless to astronomy, primarily because the opacity of the interstellar medium would prevent observations at these wavelengths. However, the interstellar medium has been found to be markedly inhomogeneous in both density and ionization state and the sun is fortunately located in a region of low extreme ultraviolet opacity. The Extreme Ultraviolet Explorer, launched in June 1992, has surveyed the sky in this wave band and has detected a wide variety of astronomical sources at considerable distances, including some extragalactic objects. Studies in the extreme ultraviolet band have already begun to increase our understanding of the contents of the universe.

  14. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1985-01-01

    The Far Ultraviolet imager (FUVI) was flown on the Aries class sounding rocket 24.015, producing outstanding results. The diffuse extreme ultraviolet (EUV) background spectrometer which is under construction is described. It will be launched on the Black Brant sounding rocket flight number 27.086. Ongoing design studies of a high resolution spectrometer are discussed. This instrument incorporates a one meter normal incidence mirror and will be suitable for an advanced Spartan mission.

  15. Photoresist composition for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  16. Far-infrared-light shadowgraphy for high extraction efficiency of extreme ultraviolet light from a CO2-laser-generated tin plasma

    NASA Astrophysics Data System (ADS)

    Matsukuma, Hiraku; Hosoda, Tatsuya; Suzuki, Yosuke; Yogo, Akifumi; Yanagida, Tatsuya; Kodama, Takeshi; Nishimura, Hiroaki

    2016-08-01

    The two-color, double-pulse method is an efficient scheme to generate extreme ultraviolet light for fabricating the next generation semiconductor microchips. In this method, a Nd:YAG laser pulse is used to expand a several-tens-of-micrometers-scale tin droplet, and a CO2 laser pulse is subsequently directed at the expanded tin vapor after an appropriate delay time. We propose the use of shadowgraphy with a CO2 laser probe-pulse scheme to optimize the CO2 main-drive laser. The distribution of absorption coefficients is derived from the experiment, and the results are converted to a practical absorption rate for the CO2 main-drive laser.

  17. Far and extreme ultraviolet astronomy with ORFEUS

    NASA Technical Reports Server (NTRS)

    Kraemer, G.; Barnstedt, J.; Eberhard, N.; Grewing, M.; Gringel, W.; Haas, C.; Kaelble, A.; Kappelmann, N.; Petrik, J.; Appenzeller, I.

    1990-01-01

    ORFEUS (Orbiting and Retrievable Far and Extreme Ultraviolet Spectrometer) is a 1 m normal incidence telescope for spectroscopic investigations of cosmic sources in the far and extreme ultraviolet spectral range. The instrument will be integrated into the freeflyer platform ASTRO-SPAS. ORFEUS-SPAS is scheduled with STS ENDEAVOUR in September 1992. We describe the telescope with its two spectrometer and their capabilities i.e., spectral range, resolution and overall sensitivity. The main classes of objects to be observed with the instrument are discussed and two examples of simulated spectra for the white dwarf HZ43 and an O9-star in LMC are shown.

  18. Forecasting solar extreme and far ultraviolet irradiance

    NASA Astrophysics Data System (ADS)

    Henney, C. J.; Hock, R. A.; Schooley, A. K.; Toussaint, W. A.; White, S. M.; Arge, C. N.

    2015-03-01

    A new method is presented to forecast the solar irradiance of selected wavelength ranges within the extreme ultraviolet (EUV) and far ultraviolet (FUV) bands. The technique is similar to a method recently published by Henney et al. (2012) to predict solar 10.7 cm (2.8 GHz) radio flux, abbreviated F10.7, utilizing advanced predictions of the global solar magnetic field generated by a flux transport model. In this and the previous study, we find good correlation between the absolute value of the observed photospheric magnetic field and selected EUV/FUV spectral bands. By evolving solar magnetic maps forward 1 to 7 days with a flux transport model, estimations of the Earth side solar magnetic field distribution are generated and used to forecast irradiance. For example, Pearson correlation coefficient values of 0.99, 0.99, and 0.98 are found for 1 day, 3 day, and 7 day predictions, respectively, of the EUV band from 29 to 32 nm. In the FUV, for example, the 160 to 165 nm spectral band, correlation values of 0.98, 0.97, and 0.96 are found for 1 day, 3 day, and 7 day predictions, respectively. In the previous study, the observed F10.7 signal is found to correlate well with strong magnetic field (i.e., sunspot) regions. Here we find that solar EUV and FUV signals are significantly correlated with the weaker magnetic fields associated with plage regions, suggesting that solar magnetic indices may provide an improved indicator (relative to the widely used F10.7 signal) of EUV and FUV nonflaring irradiance variability as input to ionospheric and thermospheric models.

  19. Coherence techniques at extreme ultraviolet wavelengths

    SciTech Connect

    Chang, Chang

    2002-10-01

    The renaissance of Extreme Ultraviolet (EUV) and soft x-ray (SXR) optics in recent years is mainly driven by the desire of printing and observing ever smaller features, as in lithography and microscopy. This attribute is complemented by the unique opportunity for element specific identification presented by the large number of atomic resonances, essentially for all materials in this range of photon energies. Together, these have driven the need for new short-wavelength radiation sources (e.g. third generation synchrotron radiation facilities), and novel optical components, that in turn permit new research in areas that have not yet been fully explored. This dissertation is directed towards advancing this new field by contributing to the characterization of spatial coherence properties of undulator radiation and, for the first time, introducing Fourier optical elements to this short-wavelength spectral region. The first experiment in this dissertation uses the Thompson-Wolf two-pinhole method to characterize the spatial coherence properties of the undulator radiation at Beamline 12 of the Advanced Light Source. High spatial coherence EUV radiation is demonstrated with appropriate spatial filtering. The effects of small vertical source size and beamline apertures are observed. The difference in the measured horizontal and vertical coherence profile evokes further theoretical studies on coherence propagation of an EUV undulator beamline. A numerical simulation based on the Huygens-Fresnel principle is performed.

  20. Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies

    SciTech Connect

    Wilson, Daniel; Rudolf, Denis Juschkin, Larissa; Weier, Christian; Adam, Roman; Schneider, Claus M.; Winkler, Gerrit; Frömter, Robert; Danylyuk, Serhiy; Bergmann, Klaus; Grützmacher, Detlev

    2014-10-15

    Generation of circularly polarized light in the extreme ultraviolet (EUV) spectral region (about 25 eV–250 eV) is highly desirable for applications in spectroscopy and microscopy but very challenging to achieve in a small-scale laboratory. We present a compact apparatus for generation of linearly and circularly polarized EUV radiation from a gas-discharge plasma light source between 50 eV and 70 eV photon energy. In this spectral range, the 3p absorption edges of Fe (54 eV), Co (60 eV), and Ni (67 eV) offer a high magnetic contrast often employed for magneto-optical and electron spectroscopy as well as for magnetic imaging. We simulated and designed an instrument for generation of linearly and circularly polarized EUV radiation and performed polarimetric measurements of the degree of linear and circular polarization. Furthermore, we demonstrate first measurements of the X-ray magnetic circular dichroism at the Co 3p absorption edge with a plasma-based EUV light source. Our approach opens the door for laboratory-based, element-selective spectroscopy of magnetic materials and spectro-microscopy of ferromagnetic domains.

  1. Extreme Ultraviolet Explorer Science Operation Center

    NASA Technical Reports Server (NTRS)

    Wong, G. S.; Kronberg, F. A.; Meriwether, H. D.; Wong, L. S.; Grassi, C. L.

    1993-01-01

    The EUVE Science Operations Center (ESOC) is a satellite payload operations center for the Extreme Ultraviolet Explorer project, located on the Berkeley campus of the University of California. The ESOC has the primary responsibility for commanding the EUVE telescopes and monitoring their telemetry. The ESOC is one of a very few university-based satellite operations facilities operating with NASA. This article describes the history, operation, and advantages of the ESOC as an on-campus operations center.

  2. The Solar Extreme Ultraviolet Monitor for MAVEN

    NASA Astrophysics Data System (ADS)

    Eparvier, F. G.; Chamberlin, P. C.; Woods, T. N.; Thiemann, E. M. B.

    2015-12-01

    The Extreme Ultraviolet (EUV) monitor is an instrument on the NASA Mars Atmosphere and Volatile EvolutioN (MAVEN) mission, designed to measure the variability of the solar soft x-rays and EUV irradiance at Mars. The solar output in this wavelength range is a primary energy input to the Mars atmosphere and a driver for the processes leading to atmospheric escape. The MAVEN EUV monitor consists of three broadband radiometers. The radiometers consist of silicon photodiodes with different bandpass-limiting filters for each channel. The filters for the radiometers are: Channel A: thin foil C/Al/Nb/C for 0.1-3 nm and 17-22 nm, Channel B: thin foil C/Al/Ti/C for 0.1-7 nm, and Channel C: interference filter for 121-122 nm. A fourth, covered photodiode is used to monitor variations in dark signal due to temperature and radiation background changes. The three science channels will monitor emissions from the highly variable corona and transition region of the solar atmosphere. The EUV monitor is mounted on the top deck of the MAVEN spacecraft and is pointed at the Sun for most of its orbit around Mars. The measurement cadence is 1-second. The broadband irradiances can be used to monitor the most rapid changes in solar irradiance due to flares. In combination with time-interpolated observations at Earth of slower varying solar spectral emissions, the broadband MAVEN EUV monitor measurements will also be used in a spectral irradiance model to generate the full EUV spectrum at Mars from 0 to 190 nm in 1-nm bins on a time cadence of 1-minute and daily averages.

  3. Experimental limits of the extreme ultraviolet background

    NASA Technical Reports Server (NTRS)

    Wulf-Mathies, C.; Grewing, M.; Kraemer, G.; Schulz-Luepertz, E.; Kimble, R.; Bixler, J.; Bowyer, S.

    1983-01-01

    Photometric observations of the diffuse extreme ultraviolet background with two photometers having bandpasses of 750-940 A and 1040-1080 A are reported. The payload, which was flown aboard an ARIES sounding rocket in June 1982, is described, including the electron detectors, filters, and calibration. The operation of the probe during the experiment, including its motions, are described. The primary experiment involved spectroscopic observation of the hot white dwarf HZ43. The photometer count rate is shown and the measurements of the diffuse background are compared with theoretical predictions. Despite the lower limits obtained using a narrowband detector, the measurements are not sensitive enough to draw any relevant astrophysical conclusions.

  4. Imaging the magnetosphere in the extreme ultraviolet

    NASA Technical Reports Server (NTRS)

    Chiu, Y. T.

    1993-01-01

    A final report on research on magnetosphere imaging in the extreme ultraviolet is presented. The objectives of the research contract can be summarized in three related items: (1) investigate the feasibility of the EUV imaging concept by using Lockheed in-situ ion measurement data; (2) investigate the technical resources required to make scientific interpretations of such EUV images by end-to-end simulations of the imaging concept; and (3) construct and test the key element for EUV magnetosphere imaging, the multilayer mirror with normal-incidence reflectance designed for the selected solar resonance line.

  5. Femtosecond transparency in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Tarana, Michal; Greene, Chris H.

    2012-06-01

    Electromagnetically induced transparency-like behavior in the extreme ultraviolet (XUV) is studied theoretically, including the effect of intense 800nm laser dressing of He 2s2p(^1P^o) and 2p^2(^2S^e) autoionizing states. We present an ab initio solution of the time-dependent Schr"odinger equation in an LS-coupling configuration interaction basis set. The method enables a rigorous treatment of optical field ionization of these coupled autoionizing states into the N = 2 continuum in addition to N = 1. Our calculated transient absorption spectra show the formation of the Autler-Townes doublet in the presence of the dressing laser field. The presented results are in encouraging agreement with experiment [1]. [4pt] [1] Z.H. Loh, C.H. Greene, and S. R. Leone, Chem. Phys. 350, 7 (2008)

  6. Absolute sensitivity calibration of extreme ultraviolet photoresists

    SciTech Connect

    Jones, Juanita; Naulleau, Patrick P.; Gullikson, Eric M.; Aquila, Andrew; George, Simi; Niakoula, Dimitra

    2008-05-16

    One of the major challenges facing the commercialization of extreme ultraviolet (EUV) lithography remains simultaneously achieving resist sensitivity, line-edge roughness, and resolution requirement. Sensitivity is of particular concern owing to its direct impact on source power requirements. Most current EUV exposure tools have been calibrated against a resist standard with the actual calibration of the standard resist dating back to EUV exposures at Sandia National Laboratories in the mid 1990s. Here they report on an independent sensitivity calibration of two baseline resists from the SEMATECH Berkeley MET tool performed at the Advanced Light Source Calibrations and Standards beamline. The results show the baseline resists to be approximately 1.9 times faster than previously thought based on calibration against the long standing resist standard.

  7. Reaction Mechanism of Extreme Ultraviolet Resists

    NASA Astrophysics Data System (ADS)

    Toriumi, Minoru; Kaneyama, Koji; Itani, Toshiro

    2008-06-01

    Molecular resist of polyphenol was evaluated as an extreme-ultraviolet resist compared with a polymer resist of poly(tert-butoxycarbonylhydroxystyrene). X-ray reflectometry was used to determine the resist-film density and measurement accuracy was improved. The molecular resist shows higher sensitivity of 3 mJ/cm2 than the polymer resist of 4 mJ/cm2. The deprotection mechanism was approximated by simple reaction equations and Fourier-transform infrared spectra was interpreted to give the products of a quantum yield and a deprotection rate constant as 9.7×10-8 and 8.1×10-8 cm3 molecule-1 s-1 for molecular and polymer resists. The higher sensitivity of the molecular resist is due to the larger efficiency of the reaction mechanism.

  8. Modeling extreme ultraviolet suppression of electrostatic analyzers

    SciTech Connect

    Gershman, Daniel J.; Zurbuchen, Thomas H.

    2010-04-15

    In addition to analyzing energy-per-charge ratios of incident ions, electrostatic analyzers (ESAs) for spaceborne time-of-flight mass spectrometers must also protect detectors from extreme ultraviolet (EUV) photons from the Sun. The required suppression rate often exceeds 1:10{sup 7} and is generally established in tests upon instrument design and integration. This paper describes a novel technique to model the EUV suppression of ESAs using photon ray tracing integrated into SIMION, the most commonly used ion optics design software for such instruments. The paper compares simulation results with measurements taken from the ESA of the Mass instrument flying onboard the Wind spacecraft. This novel technique enables an active inclusion of EUV suppression requirements in the ESA design process. Furthermore, the simulation results also motivate design rules for such instruments.

  9. The Extreme Ultraviolet Explorer - Overview and calibration

    NASA Technical Reports Server (NTRS)

    Welsh, Barry Y.; Vallerga, John V.; Jelinsky, Pat; Vedder, Peter W.; Bowyer, Stuart

    1990-01-01

    The Extreme Ultraviolet Explorer (EUVE) is a NASA-funded astronomy mission that will operate in the 70 to 760 A band. The science payload, which has been designed and built by the Space Sciences Laboratory at the University of California, Berkeley, consists of three grazing incidence scanning telescopes and an EUV spectrometer/deep survey instrument. This paper gives details of the planned mission profile and an overview of the instrumentation that the science payload comprises. Topics such as the thermal design, contamination control, and details of the electronics system are discussed. Finally, the results of the calibration of the various subsystems that make up the EUVE instrumentation are reviewed, and the calibration plan for the integrated EUVE instruments is discussed.

  10. Extreme-Ultraviolet Observations of Nine Pulsars

    NASA Astrophysics Data System (ADS)

    Seon, Kwang-Il; Edelstein, Jerry

    1998-05-01

    We report the observation of nine pulsars using the Lexan (100 Å) band of the Extreme Ultraviolet Explorer scanning telescopes. The observations, none of which resulted in positive detections, are used to derive limits to the temperature of surface thermal radiation from the objects. We compare the temperature limits with predictions from neutron star cooling models. The N_H I toward our targets limits our ability to establish rigorous limits needed to discriminate among the models. We also derive a limit to heating by magnetic monopole flux-catalyzed nucleon decay for the very old pulsar PSR J1455-3330, which is similar to the limit derived for PSR B1929+10 and 3 orders of magnitude larger than the limit for PSR J0437-4715.

  11. Scanning X-Ray Or Extreme-Ultraviolet Monochromator

    NASA Technical Reports Server (NTRS)

    Hoover, Richard

    1991-01-01

    Wavelength of peak transmission of proposed high-throughput, narrow-band-pass x-ray or extreme-ultraviolet monochromator continuously adjustable. Essential filtering and reflecting components designed according to principles described in "Compact X-Ray and Extreme-Ultraviolet Monochromator" (MFS-28499). However, angle of incidence varied to change wavelength of Bragg reflection.

  12. Extreme ultraviolet spectral irradiance measurements since 1946

    NASA Astrophysics Data System (ADS)

    Schmidtke, G.

    2015-03-01

    In the physics of the upper atmosphere the solar extreme ultraviolet (EUV) radiation plays a dominant role controlling most of the thermospheric/ionospheric (T/I) processes. Since this part of the solar spectrum is absorbed in the thermosphere, platforms to measure the EUV fluxes became only available with the development of rockets reaching altitude levels exceeding 80 km. With the availability of V2 rockets used in space research, recording of EUV spectra started in 1946 using photographic films. The development of pointing devices to accurately orient the spectrographs toward the sun initiated intense activities in solar-terrestrial research. The application of photoelectric recording technology enabled the scientists placing EUV spectrometers aboard satellites observing qualitatively strong variability of the solar EUV irradiance on short-, medium-, and long-term scales. However, as more measurements were performed more radiometric EUV data diverged due to the inherent degradation of the EUV instruments with time. Also, continuous recording of the EUV energy input to the T/I system was not achieved. It is only at the end of the last century that there was progress made in solving the serious problem of degradation enabling to monitore solar EUV fluxes with sufficient radiometric accuracy. The data sets available allow composing the data available to the first set of EUV data covering a period of 11 years for the first time. Based on the sophisticated instrumentation verified in space, future EUV measurements of the solar spectral irradiance (SSI) are promising accuracy levels of about 5% and less. With added low-cost equipment, real-time measurements will allow providing data needed in ionospheric modeling, e.g., for correcting propagation delays of navigation signals from space to earth. Adding EUV airglow and auroral emission monitoring by airglow cameras, the impact of space weather on the terrestrial T/I system can be studied with a spectral terrestrial

  13. High intensity vacuum ultraviolet and extreme ultraviolet production by noncollinear mixing in laser vaporized media

    NASA Astrophysics Data System (ADS)

    Todt, Michael A.; Albert, Daniel R.; Davis, H. Floyd

    2016-06-01

    A method is described for generating intense pulsed vacuum ultraviolet (VUV) and extreme ultraviolet (XUV) laser radiation by resonance enhanced four-wave mixing of commercial pulsed nanosecond lasers in laser vaporized mercury under windowless conditions. By employing noncollinear mixing of the input beams, the need of dispersive elements such as gratings for separating the VUV/XUV from the residual UV and visible beams is eliminated. A number of schemes are described, facilitating access to the 9.9-14.6 eV range. A simple and convenient scheme for generating wavelengths of 125 nm, 112 nm, and 104 nm (10 eV, 11 eV, and 12 eV) using two dye lasers without the need for dye changes is described.

  14. Absolute dosimetry for extreme-ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Berger, Kurt W.; Campiotti, Richard H.

    2000-06-01

    The accurate measurement of an exposure dose reaching the wafer on an extreme ultraviolet (EUV) lithographic system has been a technical challenge directly applicable to the evaluation of candidate EUV resist materials and calculating lithography system throughputs. We have developed a dose monitoring sensor system that can directly measure EUV intensities at the wafer plane of a prototype EUV lithographic system. This sensor system, located on the wafer stage adjacent to the electrostatic chuck used to grip wafers, operates by translating the sensor into the aerial image, typically illuminating an 'open' (unpatterned) area on the reticle. The absolute signal strength can be related to energy density at the wafer, and thus used to determine resist sensitivity, and the signal as a function of position can be used to determine illumination uniformity at the wafer plane. Spectral filtering to enhance the detection of 13.4 nm radiation was incorporated into the sensor. Other critical design parameters include the packaging and amplification technologies required to place this device into the space and vacuum constraints of a EUV lithography environment. We describe two approaches used to determine the absolute calibration of this sensor. The first conventional approach requires separate characterization of each element of the sensor. A second novel approach uses x-ray emission from a mildly radioactive iron source to calibrate the absolute response of the entire sensor system (detector and electronics) in a single measurement.

  15. Reflective masks for extreme ultraviolet lithography

    SciTech Connect

    Nguyen, Khanh Bao

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 {mu}m wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  16. Initial results from the extreme ultraviolet explorer

    NASA Technical Reports Server (NTRS)

    Bowyer, S.; Malina, R. F.

    1993-01-01

    Data obtained during the first five months of calibration and science operation of the Extreme Ultraviolet Explorer (EUVE) are presented. Spectra of an extragalactic object were obtained; the object is detectable to wavelenghts longer than 100 A, demonstrating that extragalactic EUV astronomy is possible. Spectra of a hot white dwarf, and a late-type star in quiescence and flaring are shown as examples of the type of spectrographic data obtainable with EUVE. Other objects for which broad band photometric mode data have been obtained and analyzed include an RS CVn star and several late-type stars. The backgrounds in the EUVE detectors are quite low and the character of the diffuse astronomical EUV background has been investigated using these very low rates. Evidence is presented showing that, contrary to previously published reports, EUVE is about three times more sensitive than the English Wide Field Camera in the short wavelength bandpass covered by both instruments. Only limited information has been extracted from the longer bandpasses coered only by EUVE. Nonetheless, the brightest EUV source in the sky, a B star, has been discovered and is detected only in these longer bandpasses.

  17. STEREO's Extreme UltraViolet Imager (EUVI)

    NASA Technical Reports Server (NTRS)

    2007-01-01

    At a pixel resolution of 2048x2048, the STEREO EUVI instrument provides views of the Sun in ultraviolet light that rivals the full-disk views of SOHO/EIT. This image is through the 171 Angstrom (ultraviolet) filter which is characteristic of iron ions (missing eight and nine electrons) at 1 million degrees. There is a short data gap in the latter half of the movie that creates a freeze and then jump in the data view. This is a movie of the Sun in 171 Angstrom ultraviolet light. The time frame is late January, 2007

  18. Extreme ultraviolet transmission of a synthetic diamond thin film

    NASA Technical Reports Server (NTRS)

    Vallerga, John V.; Gibson, J. L.; Knowles, J. L.

    1991-01-01

    Measurements are presented of a thin film of synthetic diamond at various wavelengths in the extreme ultraviolet. The synthetic diamond combines the transmission properties of carbon with the strength, density, and ruggedness of a natural diamond. The Extreme Ultraviolet Transmission (EUV) of a film of the synthetic diamond has shown the existence of a thin surface layer of silicon, probably in the form of silicon carbide, which is not a contaminant layer.

  19. Sensitivity calibration of an imaging extreme ultraviolet spectrometer-detector system for determining the efficiency of broadband extreme ultraviolet sources

    SciTech Connect

    Fuchs, S.; Roedel, C.; Bierbach, J.; Paz, A. E.; Foerster, E.; Paulus, G. G.; Krebs, M.; Haedrich, S.; Limpert, J.; Kuschel, S.; Wuensche, M.; Hilbert, V.; Zastrau, U.

    2013-02-15

    We report on the absolute sensitivity calibration of an extreme ultraviolet (XUV) spectrometer system that is frequently employed to study emission from short-pulse laser experiments. The XUV spectrometer, consisting of a toroidal mirror and a transmission grating, was characterized at a synchrotron source in respect of the ratio of the detected to the incident photon flux at photon energies ranging from 15.5 eV to 99 eV. The absolute calibration allows the determination of the XUV photon number emitted by laser-based XUV sources, e.g., high-harmonic generation from plasma surfaces or in gaseous media. We have demonstrated high-harmonic generation in gases and plasma surfaces providing 2.3 {mu}W and {mu}J per harmonic using the respective generation mechanisms.

  20. Sub-50nm extreme ultraviolet holographic imaging

    NASA Astrophysics Data System (ADS)

    Wachulak, P. W.; Marconi, M. C.; Bartels, R. A.; Menoni, C. S.; Rocca, J. J.

    2009-05-01

    Imaging tools for nanoscicence involving sub-100-nm scale objects have been dominated by atomic force microscopy (AFM), scanning tunneling microscopy (STM), and electron microscopy (SEM, TEM). These imaging techniques have contributed substantially to the development of nanoscience, providing a very powerful diagnostic tool capable of obtaining images with atomic resolution or as a subsidiary mechanism to arrange or modify surfaces also at the atomic scale [1,2]. However, some important problems have persisted traditional nanoscale imaging techniques. For example when scanning a nanometer size object that is not attached rigidly to a surface the interaction with the tip significantly perturbs the specimen degrading or eventually precluding the image acquisition. Electron microscopy often requires surface preparation, consisting of metallization of the sample to avoid surface charging. Additionally the metallization of the sample may alter its characteristics and also limits the resolution. In both cases, if the sample is large (millimeters in size) due to the limited field of view, the image obtained with these conventional methods is only representative of a very small portion of the object. Wavelength-limited holographic imaging using carbon nanotubes as the test object with a table-top extreme ultraviolet (EUV) laser operating at 46.9 nm will be discussed. The resolution achieved in this imaging is evaluated with a rigorous correlation image analysis and confirmed with the conventional knife-edge test. The nano-holography presented requires no optics or critical beam alignment; thus the hologram recording scheme is very simple and does not need special sample preparation. In holography, image contrast requires absorption to provide scattering by the illuminating beam. The EUV laser wavelength employed in this experiment (46.9nm) is advantageous because carbon based materials typically exhibit very small attenuation lengths, around 25 nm. The high absorption of

  1. Ptychographic hyperspectral spectromicroscopy with an extreme ultraviolet high harmonic comb.

    PubMed

    Zhang, Bosheng; Gardner, Dennis F; Seaberg, Matthew H; Shanblatt, Elisabeth R; Porter, Christina L; Karl, Robert; Mancuso, Christopher A; Kapteyn, Henry C; Murnane, Margaret M; Adams, Daniel E

    2016-08-01

    We report a proof-of-principle demonstration of a new scheme of spectromicroscopy in the extreme ultraviolet (EUV) spectral range, where the spectral response of the sample at different wavelengths is imaged simultaneously. This scheme is enabled by combining ptychographic information multiplexing (PIM) with a tabletop EUV source based on high harmonic generation, where four spectrally narrow harmonics near 30 nm form a spectral comb structure. Extending PIM from previously demonstrated visible wavelengths to the EUV/X-ray wavelengths promises much higher spatial resolution and a more powerful spectral contrast mechanism, making PIM an attractive spectromicroscopy method in both microscopy and spectroscopy aspects. In addition to spectromicroscopy, this method images the multicolor EUV beam in situ, making this a powerful beam characterization technique. In contrast to other methods, the techniques described here use no hardware to separate wavelengths, leading to efficient use of the EUV radiation. PMID:27505837

  2. Ultrafast Extreme Ultraviolet Induced Isomerization of Acetylene Cations

    SciTech Connect

    Jiang, Y.; Rudenko, Artem; Herrwerth, O.; Foucar, L.; Kurka, M.; Kuhnel, K.; Lezius, M.; Kling, Matthias; van Tilborg, Jeroen; Belkacem, Ali; Ueda, K.; Dusterer, S.; Treusch, R.; Schroter, Claus-Dieter; Moshammer, Robbert; Ullrich, Joachim

    2011-06-17

    Ultrafast isomerization of acetylene cations ([HC = CH]{sup +}) in the low-lying excited A{sup 2}{Sigma}{sub g}{sup +} state, populated by the absorption of extreme ultraviolet (XUV) photons (38 eV), has been observed at the Free Electron Laser in Hamburg, (FLASH). Recording coincident fragments C{sup +} + CH{sub 2}{sup +} as a function of time between XUV-pump and -probe pulses, generated by a split-mirror device, we find an isomerization time of 52 {+-} 15 fs in a kinetic energy release (KER) window of 5.8 < KER < 8 eV, providing clear evidence for the existence of a fast, nonradiative decay channel.

  3. Ultrafast Extreme Ultraviolet Induced Isomerization of Acetylene Cations

    SciTech Connect

    Jiang, Y. H.; Kurka, M.; Kuehnel, K. U.; Schroeter, C. D.; Moshammer, R.; Rudenko, A.; Foucar, L.; Herrwerth, O.; Lezius, M.; Kling, M. F.; Tilborg, J. van; Belkacem, A.; Ueda, K.; Duesterer, S.; Treusch, R.; Ullrich, J.

    2010-12-31

    Ultrafast isomerization of acetylene cations ([HC=CH]{sup +}) in the low-lying excited A{sup 2}{Sigma}{sub g}{sup +} state, populated by the absorption of extreme ultraviolet (XUV) photons (38 eV), has been observed at the Free Electron Laser in Hamburg, (FLASH). Recording coincident fragments C{sup +}+CH{sub 2}{sup +} as a function of time between XUV-pump and -probe pulses, generated by a split-mirror device, we find an isomerization time of 52{+-}15 fs in a kinetic energy release (KER) window of 5.8

  4. Nanometer scale imaging with table top extreme ultraviolet sources

    NASA Astrophysics Data System (ADS)

    Wachulak, Przemyslaw W.; Sandberg, Richard L.; Isoyan, Artak; Urbanski, Lukasz; Bartnik, Andrzej; Bartels, Randy A.; Menoni, Carmen S.; Fiedorowicz, Henryk; Rocca, Jorge J.; Marconi, Mario C.

    2010-12-01

    Decreasing the illumination wavelength allows to improve the spatial resolution in photon-based imaging systems and enables a nanometer-scale spatial resolution. Due to a significant interest in nanometer-scale spatial resolution imaging short wavelengths from extreme ultraviolet (EUV) region are often used. A few examples of various imaging techniques, such as holography, zone plate EUV microscopy, computer generated hologram EUV reconstruction, lens-less diffraction imaging and generalized Talbot self-imaging will be presented utilizing coherent and incoherent EUV sources. Some of these EUV imaging techniques lead to the high spatial resolution, better than 50nm in a very short exposure time. The techniques, presented herein, have potential to be used in actinic mask inspection for EUV lithography, mask-less lithographic processes in the nanofabrication, in material science or biology.

  5. Comparing Vacuum and Extreme Ultraviolet Radiation for Postionization of Laser Desorbed Neutrals from Bacterial Biofilms and Organic Fullerene

    SciTech Connect

    Gaspera, Gerald L.; Takahashi, Lynelle K.; Zhou, Jia; Ahmed, Musahid; Moored, Jerry F.; Hanley, Luke

    2010-12-08

    Vacuum and extreme ultraviolet radiation from 8 - 24 eV generated at a synchrotron was used to postionize laser desorbed neutrals of antibiotic-treated biofilms and a modified fullerene using laser desorption postionization mass spectrometry (LDPI-MS). Results show detection of the parent ion, various fragments, and extracellular material from biofilms using LDPI-MS with both vacuum and extreme ultraviolet photons. Parent ions were observed for both cases, but extreme ultraviolet photons (16-24 eV) induced more fragmentation than vacuum ultraviolet (8-14 eV) photons.

  6. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography

    PubMed Central

    Tarrio, Charles; Grantham, Steven; Squires, Matthew B.; Vest, Robert E.; Lucatorto, Thomas B.

    2003-01-01

    Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.12 %. We report on two upgrades of our NIST/DARPA Reflectometry Facility that have given us the ability to achieve 0.1 % repeatability and 0.3 % absolute uncertainty in our reflectivity measurements. A third upgrade, a monochromator with thermal and mechanical stability for improved wavelength repeatability, is currently in the design phase.

  7. Four-wave mixing experiments with extreme ultraviolet transient gratings

    NASA Astrophysics Data System (ADS)

    Bencivenga, F.; Cucini, R.; Capotondi, F.; Battistoni, A.; Mincigrucci, R.; Giangrisostomi, E.; Gessini, A.; Manfredda, M.; Nikolov, I. P.; Pedersoli, E.; Principi, E.; Svetina, C.; Parisse, P.; Casolari, F.; Danailov, M. B.; Kiskinova, M.; Masciovecchio, C.

    2015-04-01

    Four-wave mixing (FWM) processes, based on third-order nonlinear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enable the exploration of dynamics inaccessible by linear methods. The coherent and multi-wave nature of the FWM approach has been crucial in the development of advanced technologies, such as silicon photonics, subwavelength imaging and quantum communications. All these technologies operate at optical wavelengths, which limits the spatial resolution and does not allow the probing of excitations with energy in the electronvolt range. Extension to shorter wavelengths--that is, the extreme ultraviolet and soft-X-ray ranges--would allow the spatial resolution to be improved and the excitation energy range to be expanded, as well as enabling elemental selectivity to be achieved by exploiting core resonances. So far, FWM applications at such wavelengths have been prevented by the absence of coherent sources of sufficient brightness and of suitable experimental set-ups. Here we show how transient gratings, generated by the interference of coherent extreme-ultraviolet pulses delivered by the FERMI free-electron laser, can be used to stimulate FWM processes at suboptical wavelengths. Furthermore, we have demonstrated the possibility of observing the time evolution of the FWM signal, which shows the dynamics of coherent excitations as molecular vibrations. This result opens the way to FWM with nanometre spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics. The theoretical possibility of realizing these applications has already stimulated ongoing developments of free-electron lasers: our results show that FWM at suboptical wavelengths is feasible, and we hope that they will enable advances in present and future photon sources.

  8. Low-defect reflective mask blanks for extreme ultraviolet lithography

    SciTech Connect

    Burkhart, S C; Cerjarn, C; Kearney, P; Mirkarimi, P; Walton, C; Ray-Chaudhuri, A

    1999-03-11

    Extreme Ultraviolet Lithgraphy (EUVL) is an emerging technology for fabrication of sub-100 nm feature sizes on silicon, following the SIA roadmap well into the 21st century. The specific EUVL system described is a scanned, projection lithography system with a 4:1 reduction, using a laser plasma EUV source. The mask and all of the system optics are reflective, multilayer mirrors which function in the extreme ultraviolet at 13.4 nm wavelength. Since the masks are imaged to the wafer exposure plane, mask defects greater than 80% of the exposure plane CD (for 4:1 reduction) will in many cases render the mask useless, whereas intervening optics can have defects which are not a printing problem. For the 100 nm node, we must reduce defects to less than 0.01/cm² @ 80nm or larger to obtain acceptable mask production yields. We have succeeded in reducing the defects to less than 0.1/cm² for defects larger than 130 nm detected by visible light inspection tools, however our program goal is to achieve 0.01/cm² in the near future. More importantly though, we plan to have a detailed understanding of defect origination and the effect on multilayer growth in order to mitigate defects below the 10-2/cm² level on the next generation of mask blank deposition systems. In this paper we will discuss issues and results from the ion-beam multilayer deposition tool, details of the defect detection and characterization facility, and progress on defect printability modeling.

  9. The Extreme Ultraviolet Explorer mission - Overview and initial results

    NASA Technical Reports Server (NTRS)

    Haisch, B.; Bowyer, S.; Malina, R. F.

    1993-01-01

    The history of extreme ultraviolet (EUV) astronomy is briefly reviewed, and an overview of the Extreme Ultraviolet Explorer mission, launched into a near-earth (550 km) orbit on June 7, 1992, is presented. First, the principal objective of the mission are summarized. The instrumentation and operation of the mission are then described, with particular attention given to the sky survey instruments, the deep survey instrument, and the spectrometers. The discussion also covers the current view of the interstellar medium, early results from the mission, and future prospects for EUV astronomy.

  10. 'EXTREME ULTRAVIOLET WAVES' ARE WAVES: FIRST QUADRATURE OBSERVATIONS OF AN EXTREME ULTRAVIOLET WAVE FROM STEREO

    SciTech Connect

    Patsourakos, Spiros; Vourlidas, Angelos E-mail: vourlidas@nrl.navy.mil

    2009-08-01

    The nature of coronal mass ejection (CME)-associated low corona propagating disturbances, 'extreme ultraviolet (EUV) waves', has been controversial since their discovery by EIT on SOHO. The low-cadence, single-viewpoint EUV images and the lack of simultaneous inner corona white-light observations have hindered the resolution of the debate on whether they are true waves or just projections of the expanding CME. The operation of the twin EUV imagers and inner corona coronagraphs aboard STEREO has improved the situation dramatically. During early 2009, the STEREO Ahead (STA) and Behind (STB) spacecrafts observed the Sun in quadrature having a {approx}90 deg. angular separation. An EUV wave and CME erupted from active region 11012, on February 13, when the region was exactly at the limb for STA and hence at disk center for STB. The STEREO observations capture the development of a CME and its accompanying EUV wave not only with high cadence but also in quadrature. The resulting unprecedented data set allowed us to separate the CME structures from the EUV wave signatures and to determine without doubt the true nature of the wave. It is a fast-mode MHD wave after all.

  11. Photoemission electron microscopy using extreme ultraviolet attosecond pulse trains

    SciTech Connect

    Mikkelsen, A.; Schwenke, J.; Fordell, T.; Luo, G.; Kluender, K.; Hilner, E.; Anttu, N.; Lundgren, E.; Mauritsson, J.; Andersen, J. N.; Xu, H. Q.; L'Huillier, A.; Zakharov, A. A.

    2009-12-15

    We report the first experiments carried out on a new imaging setup, which combines the high spatial resolution of a photoemission electron microscope (PEEM) with the temporal resolution of extreme ultraviolet (XUV) attosecond pulse trains. The very short pulses were provided by high-harmonic generation and used to illuminate lithographic structures and Au nanoparticles, which, in turn, were imaged with a PEEM resolving features below 300 nm. We argue that the spatial resolution is limited by the lack of electron energy filtering in this particular demonstration experiment. Problems with extensive space charge effects, which can occur due to the low probe pulse repetition rate and extremely short duration, are solved by reducing peak intensity while maintaining a sufficient average intensity to allow imaging. Finally, a powerful femtosecond infrared (IR) beam was combined with the XUV beam in a pump-probe setup where delays could be varied from subfemtoseconds to picoseconds. The IR pump beam could induce multiphoton electron emission in resonant features on the surface. The interaction between the electrons emitted by the pump and probe pulses could be observed.

  12. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1987-01-01

    Analysis and interpretation continued on data generated by the flight of 27.086 in April of 1986 and by the successful UVX mission. Optical and mechanical design of the 1 meter EUV telescope, planned for launch with the large SPARTAN type carrier, ASTRO-SPAS, was also continued. The major effort centered on the preparation of flight 27.106, scheduled to launch in September, 1986. Work which was performed included: design of the skins and bulkheads; completion of the optical, mechanical, and electrical design; purchase of the major components of the instruments; assemblage of the electrical components; and performance of theoretical work, to support the data interpretation.

  13. Extreme ultraviolet high-harmonic spectroscopy of solids

    NASA Astrophysics Data System (ADS)

    Luu, T. T.; Garg, M.; Kruchinin, S. Yu.; Moulet, A.; Hassan, M. Th.; Goulielmakis, E.

    2015-05-01

    Extreme ultraviolet (EUV) high-harmonic radiation emerging from laser-driven atoms, molecules or plasmas underlies powerful attosecond spectroscopy techniques and provides insight into fundamental structural and dynamic properties of matter. The advancement of these spectroscopy techniques to study strong-field electron dynamics in condensed matter calls for the generation and manipulation of EUV radiation in bulk solids, but this capability has remained beyond the reach of optical sciences. Recent experiments and theoretical predictions paved the way to strong-field physics in solids by demonstrating the generation and optical control of deep ultraviolet radiation in bulk semiconductors, driven by femtosecond mid-infrared fields or the coherent up-conversion of terahertz fields to multi-octave spectra in the mid-infrared and optical frequencies. Here we demonstrate that thin films of SiO2 exposed to intense, few-cycle to sub-cycle pulses give rise to wideband coherent EUV radiation extending in energy to about 40 electronvolts. Our study indicates the association of the emitted EUV radiation with intraband currents of multi-petahertz frequency, induced in the lowest conduction band of SiO2. To demonstrate the applicability of high-harmonic spectroscopy to solids, we exploit the EUV spectra to gain access to fine details of the energy dispersion profile of the conduction band that are as yet inaccessible by photoemission spectroscopy in wide-bandgap dielectrics. In addition, we use the EUV spectra to trace the attosecond control of the intraband electron motion induced by synthesized optical transients. Our work advances lightwave electronics in condensed matter into the realm of multi-petahertz frequencies and their attosecond control, and marks the advent of solid-state EUV photonics.

  14. Advantages of a Grazing Incidence Monochromator in the Extreme Ultraviolet

    NASA Astrophysics Data System (ADS)

    Barton, Sarah; Turley, R. Steven

    2006-10-01

    One of the main goals of the BYU Thin Films group is to find optical constants for materials in the Extreme Ultraviolet. This is accomplished by taking reflection and transmission measurements. The addition of a Grazing Incidence Monochromator to our current system allows us to take reflectance measurements at wavelengths currently unavailable on the Normal Incidence Monochromator (Monarch).

  15. Extreme ultraviolet lithography mask etch study and overview

    NASA Astrophysics Data System (ADS)

    Wu, Banqiu; Kumar, Ajay; Chandrachood, Madhavi; Sabharwal, Amitabh

    2013-04-01

    An overview of extreme ultraviolet lithography (EUVL) mask etch is presented and a EUVL mask etch study was carried out. Today, EUVL implementation has three critical challenges that hinder its adoption: extreme ultraviolet (EUV) source power, resist resolution-line width roughness-sensitivity, and a qualified EUVL mask. The EUVL mask defect challenges result from defects generated during blank preparation, absorber and multilayer deposition processes, as well as patterning, etching and wet clean processes. Stringent control on several performance criteria including critical dimension (CD) uniformity, etch bias, micro-loading, profile control, defect control, and high etch selectivity requirement to capping layer is required during the resist pattern duplication on the underlying absorber layer. EUVL mask absorbers comprise of mainly tantalum-based materials rather than chrome- or MoSi-based materials used in standard optical masks. Compared to the conventional chrome-based absorbers and phase shift materials, tantalum-based absorbers need high ion energy to obtain moderate etch rates. However, high ion energy may lower resist selectivity, and could introduce defects. Current EUVL mask consists of an anti-reflective layer on top of the bulk absorber. Recent studies indicate that a native oxide layer would suffice as an anti-reflective coating layer during the electron beam inspection. The absorber thickness and the material properties are optimized based on optical density targets for the mask as well as electromagnetic field effects and optics requirements of the patterning tools. EUVL mask etch processes are modified according to the structure of the absorber, its material, and thickness. However, etch product volatility is the fundamental requirement. Overlapping lithographic exposure near chip border may require etching through the multilayer, resulting in challenges in profile control and etch selectivity. Optical proximity correction is applied to further

  16. Method for plasma formation for extreme ultraviolet lithography-theta pinch

    DOEpatents

    Hassanein, Ahmed; Konkashbaev, Isak; Rice, Bryan

    2007-02-20

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range; a collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation; and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.

  17. Multilayer reflective coatings for extreme-ultraviolet lithography

    SciTech Connect

    Montcalm, C., LLNL

    1998-03-10

    Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system.

  18. Amorphous silicon carbide coatings for extreme ultraviolet optics

    NASA Technical Reports Server (NTRS)

    Kortright, J. B.; Windt, David L.

    1988-01-01

    Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 A were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.

  19. EXCEED: an extreme ultraviolet spectrometer onboard SPRINT-A

    NASA Astrophysics Data System (ADS)

    Murakami, Go; Yoshioka, Kazuo; Yamazaki, Atsushi; Uemizu, Kazunori; Ishii, Hiroaki; Uji, Kentaro; Yoshikawa, Ichiro; Kagitani, Masato; Tsuchiya, Fuminori

    2012-09-01

    The extreme ultraviolet (EUV) telescope EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) onboard the Japan's small satellite SPRINT-A will be launched in August 2013. The EXCEED instrument will observe tenuous gases and plasmas around the planets in the solar system (e.g., Mercury, Venus, Mars, Jupiter, and Saturn). The EXCEED instrument is designed to have a spectral range of 60-145 nm with a spectral resolution of 0.4-1.0 nm. The instrument has a field of view of 400” x 140” (maximum), and the attitude fluctuations are stabilized within +/-5". The optics of the instrument consists of an entrance mirror with a diameter of 200 mm, three types of slits, two types of filters, a laminar type grating, and a 5-stage microchannel plate assembly with a resistive anode encoder. In this paper, we report the general mission overview, the instrumentations, and the results of ground calibrations.

  20. Metrology of 13-nm optics for extreme ultraviolet lithography

    SciTech Connect

    Beckwith, J.F.; Patterson, S.R.; Thompson, D.C.; Badami, V.; Smith, S.

    1997-02-03

    This report documents activities carried in support of the design and construction of an ultra-high precision measuring machine intended for the support of Extreme Ultraviolet Lithography development (for semiconductor fabrication). At the outset, this project was aimed at the overall fabrication of such a measuring machine. Shortly after initiation, however, the scope of activities was reduced and effort was concentrated on the key technical advances necessary to support such machine development: high accuracy surface sensing and highly linear distance interferometry.

  1. Grating configurations to compress extreme-ultraviolet ultrashort pulses.

    PubMed

    Frassetto, Fabio; Poletto, Luca

    2015-09-10

    It is here discussed the design of ultrafast extreme-ultraviolet (XUV) grating compressors that can be used to condition the spectral phase of ultrashort chirped pulses to compensate for the phase chirp and get closer to the Fourier limit. We discuss the two configurations that can be used to realize the compressor, the classical diffraction mount, and the off-plane one. The concept is applied to the realization of a XUV compressor with applications to free-electron lasers. PMID:26368974

  2. Ultraviolet and extreme ultraviolet spectroscopy of the solar corona at the Naval Research Laboratory.

    PubMed

    Moses, J D; Ko, Y-K; Laming, J M; Provornikova, E A; Strachan, L; Beltran, S Tun

    2015-11-01

    We review the history of ultraviolet and extreme ultraviolet spectroscopy with a specific focus on such activities at the Naval Research Laboratory and on studies of the extended solar corona and solar-wind source regions. We describe the problem of forecasting solar energetic particle events and discuss an observational technique designed to solve this problem by detecting supra-thermal seed particles as extended wings on spectral lines. Such seed particles are believed to be a necessary prerequisite for particle acceleration by heliospheric shock waves driven by a coronal mass ejection. PMID:26560611

  3. Silicon Lightweight Mirrors (SLMS) for Ultraviolet and Extreme Ultraviolet Imaging Mirrors

    NASA Technical Reports Server (NTRS)

    Goodman, W. A.; Keys, Andrew S. (Technical Monitor)

    2002-01-01

    Subtopic 01-S1.06 requires mirrors with a diameter of 0.5-2.4 meters, areal density less than 20 kg/sq m, a figure specification of 0.02-0.005 waves root mean square (rms) at 633 nanometers, a surface roughness 0.5-1 nanometers rms, and a midfrequency error of 1.0-2.5 nanometers rms for use in the infrared (IR) to extreme ultra violet (EUV) waveband. Schafer's Phase II objective is to use Silicon Lightweight Mirrors (SLMS), a novel, all-silicon, foam-core, lightweight mirror technology, to build three imaging mirrors for the Next Generation Space Telescope Near Infrared Camera (NIRCam) Engineering Test Unit: M0 (a flat), M2 (a concave sphere) and M3R (an oblate spheroid). The surface figure error specification for the NIRCam imaging mirrors is 8 nanometers rms (0.013 waves rms at 633 nanometers), equivalent to that required for ultraviolet (UV) and EUV mirrors, and this figure must be maintained at the 35 K operational temperature of NGST. The surface roughness required is 30 A rms since NIRCam operates in the visible to infrared (VIS/IR) (0.65-5 microns). We will produce mounts for mirrors M2 and M3R using the complementary thermally matched C/SiC material demonstrated by Schafer under another NASA SBIR, NAS8-98137.

  4. Extreme Ultraviolet Explorer. Long look at the next window

    NASA Technical Reports Server (NTRS)

    Maran, Stephen P.

    1991-01-01

    The Extreme Ultraviolet Explorer (EUVE) will map the entire sky to determine the existence, direction, brightness, and temperature of thousands of objects that are sources of so-called extreme ultraviolet (EUV) radiation. The EUV spectral region is located between the x-ray and ultraviolet regions of the electromagnetic spectrum. From the sky survey by EUVE, astronomers will determine the nature of sources of EUV light in our galaxy, and infer the distribution of interstellar gas for hundreds of light years around the solar system. It is from this gas and the accompanying dust in space that new stars and solar systems are born and to which evolving and dying stars return much of their material in an endless cosmic cycle of birth, death, and rebirth. Besides surveying the sky, astronomers will make detailed studies of selected objects with EUVE to determine their physical properties and chemical compositions. Also, they will learn about the conditions that prevail and the processes at work in stars, planets, and other sources of EUV radiation, maybe even quasars. The EUVE mission and instruments are described. The objects that EUVE will likely find are described.

  5. Relativistic frequency upshift to the extreme ultraviolet regime using self-induced oscillatory flying mirrors.

    PubMed

    Kim, I Jong; Pae, Ki Hong; Kim, Chul Min; Kim, Hyung Taek; Yun, Hyeok; Yun, Sang Jae; Sung, Jae Hee; Lee, Seong Ku; Yoon, Jin Woo; Yu, Tae Jun; Jeong, Tae Moon; Nam, Chang Hee; Lee, Jongmin

    2012-01-01

    Coherent short-wavelength radiation from laser-plasma interactions is of increasing interest in disciplines including ultrafast biomolecular imaging and attosecond physics. Using solid targets instead of atomic gases could enable the generation of coherent extreme ultraviolet radiation with higher energy and more energetic photons. Here we present the generation of extreme ultraviolet radiation through coherent high-harmonic generation from self-induced oscillatory flying mirrors--a new-generation mechanism established in a long underdense plasma on a solid target. Using a 30-fs, 100-TW Ti:sapphire laser, we obtain wavelengths as short as 4.9 nm for an optimized level of amplified spontaneous emission. Particle-in-cell simulations show that oscillatory flying electron nanosheets form in a long underdense plasma, and suggest that the high-harmonic generation is caused by reflection of the laser pulse from electron nanosheets. We expect this extreme ultraviolet radiation to be valuable in realizing a compact X-ray instrument for research in biomolecular imaging and attosecond physics. PMID:23187631

  6. Relativistic frequency upshift to the extreme ultraviolet regime using self-induced oscillatory flying mirrors

    PubMed Central

    Kim, I Jong; Pae, Ki Hong; Kim, Chul Min; Kim, Hyung Taek; Yun, Hyeok; Yun, Sang Jae; Sung, Jae Hee; Lee, Seong Ku; Yoon, Jin Woo; Yu, Tae Jun; Jeong, Tae Moon; Nam, Chang Hee; Lee, Jongmin

    2012-01-01

    Coherent short-wavelength radiation from laser–plasma interactions is of increasing interest in disciplines including ultrafast biomolecular imaging and attosecond physics. Using solid targets instead of atomic gases could enable the generation of coherent extreme ultraviolet radiation with higher energy and more energetic photons. Here we present the generation of extreme ultraviolet radiation through coherent high-harmonic generation from self-induced oscillatory flying mirrors—a new-generation mechanism established in a long underdense plasma on a solid target. Using a 30-fs, 100-TW Ti:sapphire laser, we obtain wavelengths as short as 4.9 nm for an optimized level of amplified spontaneous emission. Particle-in-cell simulations show that oscillatory flying electron nanosheets form in a long underdense plasma, and suggest that the high-harmonic generation is caused by reflection of the laser pulse from electron nanosheets. We expect this extreme ultraviolet radiation to be valuable in realizing a compact X-ray instrument for research in biomolecular imaging and attosecond physics. PMID:23187631

  7. Line image sensors for spectroscopic applications in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Banyay, Matus; Brose, Sascha; Juschkin, Larissa

    2009-10-01

    The spectral range of extreme ultraviolet radiation (XUV or EUV) is an active area of research incorporating many scientific fields such as microscopy, lithography or reflectometry. During the last decade, a lot of effort has been put into transferring many of the known techniques developed at linear accelerators into the laboratory using discharge-produced plasmas (DPPs) or laser-produced plasmas (LPPs) as an alternative light source. In particular, the semiconductor industry is in need of on-site tools in the shorter wavelength range for production and inspection of structured surfaces with nanometer resolution. Here traditional charge coupled device (CCD) image sensors are inapplicable as detectors because of the strong absorption of XUV by matter prohibiting any generation of electron-hole pairs inside a deep lying p-n junction. As a solution, two-dimensional backthinned CCDs are available in the market offering high sensitivity to XUV light. Although for many applications a one-dimensional line scanning image sensor would be sufficient, they are non-existent for XUV. It is only lately that manufacturers have started to adopt the principle of backthinning to CCD line sensors to enhance sensitivity in the long wavelength UV range (>200 nm). Here we show that generally these compact sensors offer good quantum efficiencies in the XUV which make them a candidate for many spectroscopic applications and future industrial inline inspection tools for which costly two-dimensional CCDs are oversized. We have successfully implemented a compact sensor device into a laboratory XUV spectrometer and reflectometer. Our measurements compare the quantum efficiency of a state-of-the-art XUV array CCD to a phosphor-coated line sensor and a new backthinned line sensor. Additionally, we show recorded spectra from a laboratory DPP source to demonstrate the potential of a wide range of applications.

  8. Four wave mixing experiments with extreme ultraviolet transient gratings

    PubMed Central

    Bencivenga, F.; Cucini, R.; Capotondi, F.; Battistoni, A.; Mincigrucci, R.; Giangrisostomi, E.; Gessini, A.; Manfredda, M.; Nikolov, I. P.; Pedersoli, E.; Principi, E.; Svetina, C.; Parisse, P.; Casolari, F.; Danailov, M. B.; Kiskinova, M.; Masciovecchio, C.

    2015-01-01

    Four wave mixing (FWM) processes, based on third-order non-linear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enables to explore dynamics inaccessible by linear methods.1-7 The coherent and multi-wave nature of FWM approach has been crucial in the development of cutting edge technologies, such as silicon photonics,8 sub-wavelength imaging9 and quantum communications.10 All these technologies operate with optical wavelengths, which limit the spatial resolution and do not allow probing excitations with energy in the eV range. The extension to shorter wavelengths, that is the extreme ultraviolet (EUV) and soft-x-ray (SXR) range, will allow to improve the spatial resolution and to expand the excitation energy range, as well as to achieve elemental selectivity by exploiting core resonances.5-7,11-14 So far FWM applications at these wavelengths have been prevented by the absence of coherent sources of sufficient brightness and suitable experimental setups. Our results show how transient gratings, generated by the interference of coherent EUV pulses delivered by the FERMI free electron laser (FEL),15 can be used to stimulate FWM processes at sub-optical wavelengths. Furthermore, we have demonstrated the possibility to read the time evolution of the FWM signal, which embodies the dynamics of coherent excitations as molecular vibrations. This result opens the perspective for FWM with nanometer spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics.5-7 The theoretical possibility to realize these applications have already stimulated dedicated and ongoing FEL developments;16-20 today our results show that FWM at sub-optical wavelengths is feasible and would be the spark to the further advancements of the present and new sources. PMID:25855456

  9. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography

    DOEpatents

    Chapman, Henry N.; Nugent, Keith A.

    2002-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  10. Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography

    DOEpatents

    Chapman, Henry N.; Nugent, Keith A.

    2001-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  11. An Extreme Flux Vacuum Ultraviolet/Ultraviolet Beamline For The Measurement Of Biological Circular Dichroism

    SciTech Connect

    Clarke, D.T.; Vasanthi, N.; Shaw, D.; Brown, A.; Todd, B.; Grant, A.F.; Flaherty, J.V.; Mullacrane, I.D.; Miller, M.J.; Bowler, M.A.; Jones, G.R.; Mythen, C.

    2004-05-12

    A new extreme flux vacuum ultraviolet bending magnet beamline (CD12) has been commission at the SRS, Daresbury. The beamline has met all of its designed performance parameters and these are detailed. The clear advantages of SRCD over CD undertaken on conventional instruments are discussed and examples of its capabilities in terms of measurement precision and enhanced signal-to-noise for both steady-state CD and time-resolved CD are given.

  12. Extreme ultraviolet lithography: A few more pieces of the puzzle

    SciTech Connect

    Anderson, Christopher N.

    2009-05-20

    The work described in this dissertation has improved three essential components of extreme ultraviolet (EUV) lithography: exposure tools, photoresist, and metrology. Exposure tools. A field-averaging illumination stage is presented that enables nonuniform, high-coherence sources to be used in applications where highly uniform illumination is required. In an EUV implementation, it is shown that the illuminator achieves a 6.5% peak-to-valley intensity variation across the entire design field of view. In addition, a design for a stand-alone EUV printing tool capable of delivering 15 nm half-pitch sinusoidal fringes with available sources, gratings and nano-positioning stages is presented. It is shown that the proposed design delivers a near zero line-edge-rougness (LER) aerial image, something extremely attractive for the application of resist testing. Photoresist. Two new methods of quantifying the deprotection blur of EUV photoresists are described and experimentally demonstrated. The deprotection blur, LER, and sensitivity parameters of several EUV photoresists are quantified simultaneously as base weight percent, photoacid generator (PAG) weight percent, and post-exposure bake (PEB) temperature are varied. Two surprising results are found: (1) changing base weight percent does not significantly affect the deprotection blur of EUV photoresist, and (2) increasing PAG weight percent can simultaneously reduce LER and E-size in EUV photoresist. The latter result motivates the development of an EUV exposure statistics model that includes the effects of photon shot noise, the PAG spatial distribution, and the changing of the PAG distribution during the exposure. In addition, a shot noise + deprotection blur model is used to show that as deprotection blur becomes large relative to the size of the printed feature, LER reduction from improved counting statistics becomes dominated by an increase in LER due to reduced deprotection contrast. Metrology. Finally, this

  13. Extreme ultraviolet radiation emitted by helium microwave driven plasmas

    NASA Astrophysics Data System (ADS)

    Espinho, S.; Felizardo, E.; Tatarova, E.; Alves, L. L.

    2016-06-01

    The extreme ultraviolet radiation emitted by helium microwave-driven (2.45 GHz) plasmas operating at low-pressure conditions was investigated. Novel data regarding emitted spectral lines of excited helium atoms and ions in the 20-33 nm wavelength range and their intensity behavior with variation of discharge operational conditions are presented. The intensity of all the spectral emissions was found to strongly increase with the microwave power delivered to the plasma. Furthermore, the intensity of the ionic spectral emissions decreases by nearly one order of magnitude as the pressure was raised from 0.2 to 0.5 mbar.

  14. Extreme ultraviolet and visible spectroscopy of promethiumlike heavy ions

    NASA Astrophysics Data System (ADS)

    Kobayashi, Yusuke; Kubota, Kai; Omote, Kazuki; Komatsu, Akihiro; Sakoda, Junpei; Minoshima, Maki; Kato, Daiji; Li, Jiguang; Sakaue, Hiroyuki A.; Murakami, Izumi; Nakamura, Nobuyuki

    2015-08-01

    We present extreme ultraviolet and visible spectra of promethiumlike tungsten and gold obtained with an electron beam ion trap. Although the contributions from a few charge states are involved in the spectra, the charge state of the ion assigned to the observed lines is definitely identified by the time-of-flight (TOF) analysis of the ions performed at the same time with the spectroscopic measurements. Experimental results are compared with collisional-radiative model calculations as well as previous experimental and theoretical studies. Some ambiguous identifications in the previous observations have been clarified owing to the definite identification by the TOF analysis.

  15. High numerical aperture projection system for extreme ultraviolet projection lithography

    DOEpatents

    Hudyma, Russell M.

    2000-01-01

    An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.

  16. Critical illumination condenser for extreme ultraviolet projection lithography

    NASA Astrophysics Data System (ADS)

    Cohen, S. J.; Seppala, L. G.

    1995-03-01

    A condenser system couples a radiation source to an imaging system. The authors have designed a critical illumination condenser system which meets the technical challenges of extreme ultraviolet projection lithography based on a ring field imaging system and a laser produced plasma source. The optical system, a three spherical mirror optical design, is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. This type of condenser optical design is sufficiently versatile to be employed with two distinct systems, one from Lawrence Livermore National Laboratory and one from AT and T/Sandia.

  17. A rocket measurement of the extreme ultraviolet dayglow

    NASA Technical Reports Server (NTRS)

    Christensen, A. B.

    1976-01-01

    Extreme ultraviolet spectra of the mid-latitude dayglow in the wavelength range of 550 to 1250A have been obtained with a rocket borne grating spectrometer at a resolution of 20A. Spectra were obtained in the altitude range of 140 to 280 km. The spectra are dominated by emissions from atomic multiplets and no molecular bands have been identified with certainty. The strongest emissions other than H Lyman-alpha are OI (989) and OII (834). Other prominent emissions include He I(584), N II(916) and N II(1085). An unexpected feature near 612A has an intensity comparable to He I(584).

  18. Self-cleaning optic for extreme ultraviolet lithography

    DOEpatents

    Klebanoff, Leonard E.; Stulen, Richard H.

    2003-12-16

    A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.

  19. Extreme ultraviolet emission spectra of Gd and Tb ions

    SciTech Connect

    Kilbane, D.; O'Sullivan, G.

    2010-11-15

    Theoretical extreme ultraviolet emission spectra of gadolinium and terbium ions calculated with the Cowan suite of codes and the flexible atomic code (FAC) relativistic code are presented. 4d-4f and 4p-4d transitions give rise to unresolved transition arrays in a range of ions. The effects of configuration interaction are investigated for transitions between singly excited configurations. Optimization of emission at 6.775 nm and 6.515 nm is achieved for Gd and Tb ions, respectively, by consideration of plasma effects. The resulting synthetic spectra are compared with experimental spectra recorded using the laser produced plasma technique.

  20. MoRu/Be multilayers for extreme ultraviolet applications

    DOEpatents

    Bajt, Sasa C.; Wall, Mark A.

    2001-01-01

    High reflectance, low intrinsic roughness and low stress multilayer systems for extreme ultraviolet (EUV) lithography comprise amorphous layers MoRu and crystalline Be layers. Reflectance greater than 70% has been demonstrated for MoRu/Be multilayers with 50 bilayer pairs. Optical throughput of MoRu/Be multilayers can be 30-40% higher than that of Mo/Be multilayer coatings. The throughput can be improved using a diffusion barrier to make sharper interfaces. A capping layer on the top surface of the multilayer improves the long-term reflectance and EUV radiation stability of the multilayer by forming a very thin native oxide that is water resistant.

  1. Tabletop Extreme Ultraviolet Spectroscopy of Element-Specific Organometallic Photophysics

    NASA Astrophysics Data System (ADS)

    Vura-Weis, Josh

    High-harmonic extreme ultraviolet (XUV) spectroscopy has the potential to provide the elemental, oxidation-state, and spin-state specificity of core-level spectroscopy with the convenience and ultrafast time resolution of tabletop laser sources. We will show that M-edge spectroscopy of first-row transition metal complexes (3p -->3d excitation) is a sensitive probe of the electronic structure of organometallic complexes in solution. Furthermore, this technique can be used to determine the relaxation dynamics of these molecules in the first few femtoseconds to nanoseconds after photoexcitation.

  2. Chemical vapor deposited silicon carbide mirrors for extreme ultraviolet applications

    NASA Astrophysics Data System (ADS)

    Keski-Kuha, Ritva A.; Osantowski, John F.; Leviton, Douglas B.; Saha, Timo T.; Wright, Geraldine A.; Boucarut, Rene A.; Fleetwood, Charles M.; Madison, Timothy J.

    1997-01-01

    Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency in the extreme ultraviolet (EUV). For example, the development of the chemical vapor deposition (CVD) SiC mirrors provides an opportunity to extend the range of normal-incidence instruments dow to 60 nm. CVD SiC is a highly polishable material yielding low- scattering surfaces. High UV reflectivity and desirable mechanical and thermal properties make CVD SiC an attractive mirror and/or coating material for EUV applications. The EUV performance of SiC mirrors, as well as some strengths and problem areas, is discussed.

  3. The Emergence of Alternative Developers for Extreme Ultraviolet Lithography

    NASA Astrophysics Data System (ADS)

    Itani, Toshiro; Santillan, Julius Joseph

    2010-09-01

    Recent work on extreme ultraviolet (EUV) resists has shown the application of alternative resist processes as a possible solution to achieve lithographic performance targets. In this study, the potential of tetrabutylammonium hydroxide (TBAH) as a possible alternative to the currently used tetramethylammonium hydroxide developer solution was investigated. A significant improvement in lithographic performance was achieved using the TBAH developer. However, this developer solution has a relatively high freezing temperature, particularly at high concentrations. We report that the addition of glycerin to the TBAH developer lowered the freezing temperature without adversely affecting lithographic performance.

  4. Characteristics of extreme ultraviolet emission from high-Z plasmas

    NASA Astrophysics Data System (ADS)

    Ohashi, H.; Higashiguchi, T.; Suzuki, Y.; Kawasaki, M.; Suzuki, C.; Tomita, K.; Nishikino, M.; Fujioka, S.; Endo, A.; Li, B.; Otsuka, T.; Dunne, P.; O'Sullivan, G.

    2016-03-01

    We demonstrate the extreme ultraviolet (EUV) and soft x-ray sources in the 2 to 7 nm spectral region related to the beyond EUV (BEUV) question at 6.x nm and the water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays (UTAs), extending below the carbon K edge (4.37 nm). An outline of a microscope design for single-shot live cell imaging is proposed based on high-Z plasma UTA source, coupled to multilayer mirror optics.

  5. Interferometry in the Extreme Ultraviolet and X-Ray

    NASA Technical Reports Server (NTRS)

    Cash, W.; Shipley, A.; Osterman, S.; Joy, M. K.

    2000-01-01

    We report on demonstration of an x-ray interferometer that uses plane mirrors at grazing incidence to create interference fringes in the extreme ultraviolet and soft x-ray portions of the spectrum. X-ray interferometry has historically been implemented through narrow band, diffractive systems that split the wavefront. Our system, by using two separate optical channels to create interference from two areas of the wavefront, has broad band response and much higher efficiency. We discuss some applications of this technique to astronomy and microscopy including the possibility of eventually capturing a micro-arcsecond image of a black hole.

  6. Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

    SciTech Connect

    Jody Corso, Alain; Nicolosi, Piergiorgio; Nardello, Marco; Guglielmina Pelizzo, Maria; Department of Information Engineering, University of Padova, via Gradenigo 6 Zuppella, Paola; Barkusky, Frank; KLA-Tencor, 5 Technology Dr., Milpitas, California 95035 ; Mann, Klaus; Mueller, Matthias

    2013-05-28

    Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneath.

  7. Understanding the Early Evolution of M dwarf Extreme Ultraviolet Radiation

    NASA Astrophysics Data System (ADS)

    Peacock, Sarah; Barman, Travis; Shkolnik, Evgenya

    2015-11-01

    The chemistry and evolution of planetary atmospheres depends on the evolution of high-energy radiation emitted by its host star. High levels of extreme ultraviolet (EUV) radiation can drastically alter the atmospheres of terrestrial planets through ionizing, heating, expanding, chemically modifying and eroding them during the first few billion years of a planetary lifetime. While there is evidence that stars emit their highest levels of far and near ultraviolet (FUV; NUV) radiation in the earliest stages of their evolution, we are currently unable to directly measure the EUV radiation. Most previous stellar atmosphere models under-predict FUV and EUV emission from M dwarfs; here we present new models for M stars that include prescriptions for the hot, lowest density atmospheric layers (chromosphere, transition region and corona), from which this radiation is emitted. By comparing our model spectra to GALEX near and far ultraviolet fluxes, we are able to predict the evolution of EUV radiation for M dwarfs from 10 Myr to a few Gyr. This research is the next major step in the HAZMAT (HAbitable Zones and M dwarf Activity across Time) project to analyze how the habitable zone evolves with the evolving properties of stellar and planetary atmospheres.

  8. EDITORIAL: Extreme Ultraviolet Light Sources for Semiconductor Manufacturing

    NASA Astrophysics Data System (ADS)

    Attwood, David

    2004-12-01

    The International Technology Roadmap for Semiconductors (ITRS) [1] provides industry expectations for high volume computer chip fabrication a decade into the future. It provides expectations to anticipated performance and requisite specifications. While the roadmap provides a collective projection of what international industry expects to produce, it does not specify the technology that will be employed. Indeed, there are generally several competing technologies for each two or three year step forward—known as `nodes'. Recent successful technologies have been based on KrF (248 nm), and now ArF (193 nm) lasers, combined with ultraviolet transmissive refractive optics, in what are known as step and scan exposure tools. Less fortunate technologies in the recent past have included soft x-ray proximity printing and, it appears, 157 nm wavelength F2 lasers. In combination with higher numerical aperture liquid emersion optics, 193 nm is expected to be used for the manufacture of leading edge chip performance for the coming five years. Beyond that, starting in about 2009, the technology to be employed is less clear. The leading candidate for the 2009 node is extreme ultraviolet (EUV) lithography, however this requires that several remaining challenges, including sufficient EUV source power, be overcome in a timely manner. This technology is based on multilayer coated reflective optics [2] and an EUV emitting plasma. Following Moore's Law [3] it is expected, for example, that at the 2009 `32 nm node' (printable patterns of 32 nm half-pitch), isolated lines with 18 nm width will be formed in resist (using threshold effects), and that these will be further narrowed to 13 nm in transfer to metalized electronic gates. These narrow features are expected to provide computer chips of 19 GHz clock frequency, with of the order of 1.5 billion transistors per chip [1]. This issue of Journal of Physics D: Applied Physics contains a cluster of eight papers addressing the critical

  9. Stress-induced pellicle analysis for extreme-ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Park, Eun-Sang; Kim, Min-Ha; Hwang, Sollee; Kim, Jung Hwan; Oh, Hye-Keun

    2016-03-01

    The defect on the extreme ultraviolet (EUV) mask can cause image quality degradation on the wafer and also poses a serious problem for achieving high volume manufacturing (HVM). Using a pellicle could decrease the critical size of a defect by taking the defect away from the focal plane of a mask. Considering the double pass transmission for the thickness of extreme ultraviolet lithography EUVL pellicle should be ~ nm thin. For ~ nm thin pellicle, the thermal stress by EUV light exposure may damage the pellicle. Therefore, an investigation of thermal stress is desired for reliable EUV light transmission through pellicle. Therefore, we calculated the total stress and compared with material maximum stress of the pellicle. Breaking or the safety of the pellicle could be determined by the induced total stress, however, the cyclic exposure heating could decrease the material maximum stress of the pellicle. The c-Si (crystalline silicon) has good mechanical durability than the p-Si (poly-crystalline silicon) under cyclic thermal exposure.

  10. Spectrophotometry of extreme helium stars - Ultraviolet fluxes and effective temperatures

    NASA Technical Reports Server (NTRS)

    Heber, U.; Drilling, J. S.; Schoenberner, D.; Lynas-Gray, A. E.

    1984-01-01

    Ultraviolet flux distributions are presented for the extremely helium rich stars BD +10 deg 2179, HD 124448, LSS 3378, BD -9 deg 4395, LSE 78, HD 160641, LSIV -1 deg 2, BD 1 deg 3438, HD 168476, MV Sgr, LS IV-14 deg 109 (CD -35 deg 11760), LSII +33 deg 5 and BD +1 deg 4381 (LSIV +2 deg 13) obtained with the International Ultraviolet Explorer (IUE). Broadband photometry and a newly computed grid of line blanketed model atmospheres were used to determine accurate angular diameters and total stellar fluxes. The resultant effective temperatures are in most cases in satisfactory agreement with those based on broadband photometry and/or high resolution spectroscopy in the visible. For two objects, LSII +33 deg 5 and LSE 78, disagreement was found between the IUE observations and broadband photometry: the colors predict temperatures around 20,000 K, whereas the UV spectra indicate much lower photospheric temperatures of 14,000 to 15,000 K. The new temperature scale for extreme helium stars extends to lower effective temperatures than that of Heber and Schoenberner (1981) and covers the range from 8,500 K to 32,000 K. Previously announced in STAR as N83-24433

  11. Characterization of Multilayer Reflective Coatings for Extreme Ultraviolet Lithography

    SciTech Connect

    Wedowski, M.; Gullikson, E.M.; Underwood, J.H.; Spiller, E.A.; Montcalm, C.; Kearney, P.A.; Bajt, S.; Schmidt, M.A.; Folta, J.A.

    1999-11-01

    The synchrotron-based reflectometer at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley is an important metrology tool within the current Extreme Ultraviolet Lithography (EUVL) program. This program is a joint activity of three National Laboratories and a consortium of leading semiconductor manufacturers. Its goal is the development of a technology for routine production of sub-100 nm feature sizes for microelectronic circuits. Multilayer-coated normal-incidence optical surfaces reflecting in the Extreme Ultraviolet (EUV) spectral range near 13 nm are the basis for this emerging technology. All optical components of EUV lithographic steppers need to be characterized at-wavelength during their development and manufacturing process. Multilayer coating uniformity and gradient, accurate wavelength matching and high peak reflectances are the main parameters to be optimized. The mechanical and optical properties of the reflectometer at ALS beamline 6.3.2 proved to be well suited for the needs of the current EUVL program. In particular the facility is highly precise in its wavelength calibration and the determination of absolute EUV reflectance. The reproducibility of results of measurements at ALS beamline 6.3.2 is 0.2 % for reflectivity and 0.002 nm for wavelength.

  12. Studying Laser-Induced Spin Currents Using Ultrafast Extreme Ultraviolet Light

    NASA Astrophysics Data System (ADS)

    Turgut, Emrah

    Next-generation magnetic-memory devices and heat-assisted magnetic-recording applications will require a better understanding of magnetic multilayers and their interactions with optical-laser pulses. In this thesis, by combining the advantages of ultrabroad-band extreme-ultraviolet light including ultrafast time resolution, element selectivity and tabletop easy access, I report three findings in the study of ultrafast magnetization dynamics in itinerant ferromagnets. First, I experimentally prove that the transverse magneto-optical Kerr response with extreme-ultraviolet light has a purely magnetic origin and that our experimental technique is an artifact-free ultrafast magnetic probe. Second, I demonstrate the first ultrafast magnetization enhancement driven by ultrafast spin currents in Ni/Ru/Fe multilayers. Third, I engineer the sample system by choosing either insulating or spin-scattering spacer layers between the Ni and Fe magnetic layers and by structural ordering. Then, I control the competition between ultrafast spin-flip scattering and superdiffusive spin-current mechanisms; either of these processes may to be the dominant mechanism in ultrafast demagnetization. Finally, I report two continuing experiments that are promising for future ultrafast magnetization studies with extreme-ultraviolet sources. These experiments are resonant-magnetic small-angle-scattering and the generation of bright circularly polarized high harmonics accompanied by a demonstration of the first x-ray magnetic circular dichroism with a tabletop system.

  13. The Second Extreme Ultraviolet Explorer Right Angle Program Catalog

    NASA Astrophysics Data System (ADS)

    Christian, D. J.; Craig, N.; Cahill, W.; Roberts, B.; Malina, R. F.

    1999-05-01

    We present the detection of 235 extreme ultraviolet sources, of which 169 are new detections, using the Extreme Ultraviolet Explorer's (EUVE) Right Angle Program (RAP) data. This catalog includes observations since the first EUVE RAP catalog (1994 January) and covers 17% of the sky. The EUVE RAP uses the all-sky survey telescopes (also known as ``scanners''), mounted at right angles to the Deep Survey and spectrometer instruments, to obtain photometric data in four wavelength bands centered at ~100 Å (Lexan/B), ~200 Å (Al/Ti/C), ~400 Å (Ti/Sb/Al), and ~550 Å (Sn/SiO). This allows the RAP to accumulate data serendipitously during pointed spectroscopic observations. The long exposure times possible with RAP observations provide much greater sensitivity than the all-sky survey. We present EUVE source count rates and probable source identifications from the available catalogs and literature. The source distribution is similar to previous extreme ultraviolet (EUV) catalogs with 2% early-type stars, 45% late-type stars, 8% white dwarfs, 6% extragalactic, 24% with no firm classification, and 15% with no optical identification. We also present 36 detections of early-type stars that are probably the result of non-EUV radiation. We have detected stellar flares from approximately 12 sources, including: EUVE J0008+208, M4 star G32-6 (EUVE J0016+198), a new source EUVE J0202+105, EUVE J0213+368, RS CVn V711 Tau (EUVE J0336+005), BY Draconis type variable V837 Tau (EUVE J0336+259), the new K5 binary EUVE J0725-004, EUVE J1147+050, EUVE J1148-374, EUVE J1334-083 (EQ Vir), EUVE J1438-432 (WT 486/487), EUVE J1808+297, and the M5.5e star G208-45 (EUVE J1953+444). We present sample light curves for the brighter sources.

  14. Solar extreme ultraviolet irradiance: Present, past, and future

    NASA Astrophysics Data System (ADS)

    Lean, J. L.; Woods, T. N.; Eparvier, F. G.; Meier, R. R.; Strickland, D. J.; Correira, J. T.; Evans, J. S.

    2011-01-01

    New models of solar extreme ultraviolet (EUV) irradiance variability are constructed in 1 nm bins from 0 to 120 nm using multiple regression of the Mg II and F10.7 solar activity indices with irradiance observations made during the descending phase of cycle 23. The models have been used to reconstruct EUV spectra daily since 1950, annually since 1610, to forecast daily EUV irradiance and to estimate future levels in cycle 24. A two-component model developed by scaling the observed rotational modulation of the two solar indices underestimates the solar cycle changes that the Solar EUV Experiment (SEE) reports at wavelengths shorter than 40 nm and longer than 80 nm. A three-component model implemented by including an additional term derived from the smoothed Mg II index better reproduces the measurements at all wavelengths. The three-component model is consistent with variations in the EUV energy from 0 to 45 nm that produces the far ultraviolet (FUV) terrestrial dayglow observed by the Global Ultraviolet Imager (GUVI). However, the spectral structure of this third component is complex, and its origin is uncertain. Analogous two- and three-component models are also developed with absolute scales determined by the NRLEUV2 spectrum of the quiet Sun rather than by the SEE average spectrum. Assessment of the EUV absolute spectrum and variability of the four different models indicate that during solar cycle 23, the EUV irradiance (0 to 120 nm) increased 100 ± 30%, from 2.9 ± 0.2 to 5.8 ± 0.9 mWm-2, and may have been as low as 1.9 ± 0.5 mWm-2 during the 17th-century Maunder Minimum. Near the peak of upcoming solar cycle 24, EUV irradiance is expected to increase 40% to 80% above the 2008 minimum values.

  15. Toward defect-free fabrication of extreme ultraviolet photomasks

    NASA Astrophysics Data System (ADS)

    Qi, Zhengqing John; Rankin, Jed H.; Lawliss, Mark; Badger, Karen D.; Turley, Christina

    2016-04-01

    Defect-free fabrication of extreme ultraviolet (EUV) masks relies on the appropriate detection of native defects and subsequent strategies for their elimination. Commercial unavailability of actinic mask-blank inspection systems motivates the identification of an optical inspection methodology most suitable for finding relevant EUV blank defects. Studies showed that 193-nm wavelength inspection found the greatest number of printable defects as compared with rival higher-wavelength systems, establishing deep ultraviolet inspections as the blank defectivity baseline for subsequent mitigation strategies. Next, defect avoidance via pattern shifting was explored using representative 7-nm node metal/contact layer designs and 193-nm mask-blank inspection results. It was found that a significant percentage of native defects could be avoided only when the design was limited to active patterns (i.e., layouts without dummy fill). Total pattern-defect overlap remained ≤5 when metal layer blanks were chosen from the top 35% least defective substrates, while the majority of blanks remained suitable for contacts layers due to a lower active pattern density. Finally, nanomachining was used to address remaining native/multilayer defects. Native catastrophic defects were shown to recover 40% to 70% of target critical dimension after nanomachining, demonstrating the enormous potential for compensating multilayer defects.

  16. Extreme- and far-ultraviolet environment at shuttle altitudes

    SciTech Connect

    Chakrabarti, S.

    1987-01-01

    The astronomical data obtained by the Far Ultraviolet Space Telescope (FAUST) and the Very Wide Field Camera (VWFC) on board the Spacelab I mission have triggered questions on the natural and induced Extreme and Far Ultraviolet (EUV and FUV) environment of the space shuttle. Moreover, the recent discovery of approx. lk Rayleighs N/sub 2/ Lyman Birge Hopfield (LBH) nightglow emissions by the U.S. Air Force's S3-4 satellite, and subsequent confirmation by the Imaging Spectrometric Observatory (ISO) experiment on the Spacelab I mission have serious implications for the astronomical observations from the shuttle. Since both ISO and S3-4 experiments were conducted from shuttle altitudes, the implied EUV and FUV environment for astronomical observations can be severe. In order to address the question of the suitability of the shuttle as an astronomical platform, data from FAUST and other experiments were examined. It is concluded that the FAUST background is most likely due to the observation of tropical UV arcs, a natural airglow phenomenon. Strategies for future shuttle experiments to overcome this and other natural emissions are discussed.

  17. Extreme ultraviolet explorer satellite observation of Jupiter's Io plasma torus

    NASA Technical Reports Server (NTRS)

    Hall, D. T; Gladstone, G. R.; Moos, H. W.; Bagenal, F.; Clarke, J. T.; Feldman, P. D.; Mcgrath, M. A.; Schneider, N. M.; Shemansky, D. E.; Strobel, D. F.

    1994-01-01

    We present the first Extreme Ultraviolet Explorer (EUVE) satellite observation of the Jupiter system, obtained during the 2 day period 1993 March 30 through April 1, which shows a rich emission-line spectrum from the Io plasma torus spanning wavelengths 370 to 735 A. The emission features correspond primarily to known multiplets of oxygen and sulfur ions, but a blended feature near 372 A is a plausible Na II transition. The summed detected energy flux of (7.2 +/- 0.2) x 10(exp -11) ergs/sq cm(s) corresponds to a radiated power of approximately equal to 4 x 10(exp 11) W in this spectral range. All ansa emissions show a distinct dawn-dusk brightness asymmetry and the measured dusk/dawn ratio of the bright S III lambda-680 feature is 2.3 +/- 0.3, significantly larger than the ratio measured by the Voyager spacecraft ultraviolet (UV) instruments. A preliminary estimate of ion partitioning indicates that the oxygen/sulfur ion ratio is approximately equal to 2, compared to the value approximately equal to 1.3 measured by Voyager, and that (Na(+))/(e) greater than 0.01.

  18. Efficient extreme ultraviolet transmission gratings for plasma diagnostics

    NASA Astrophysics Data System (ADS)

    Braig, Christoph; Predehl, Peter; Kley, Ernst-Bernhard

    2011-06-01

    We report on a theoretical study of free-standing phase transmission gratings for high-resolution extreme ultraviolet (EUV) and soft x-ray spectroscopy and investigate their properties. Designed for wavelengths between about 2 and 40 nm, the devices may provide a first order diffraction efficiency beyond 30%. We use rigorous coupled wave analysis methods in order to optimize the grating design parameters and discuss features of segmented grating arrays. Elemental, as well as compound, materials such as Be, Mo, LiF, and poly-(methylmethacrylate) are considered with respect to their potential and practical limitations in terms of feasibility and sensitivity to radiation damage. Simulations are performed for several samples on the radiation produced by a table-top EUV plasma source and applications to astrophysical problems are considered.

  19. Electron impact excitation of argon in the extreme vacuum ultraviolet

    NASA Technical Reports Server (NTRS)

    Mentall, J. E.; Morgan, H. D.

    1976-01-01

    Polarization-free excitation cross sections in the extreme vacuum ultraviolet have been measured for electron impact on Ar. Observed spectral features were those lines of Ar I and Ar II which lie between 700 and 1100 A. Excitation functions were measured for the Ar I resonance line at 1048 A and the Ar II resonance line at 920 A. Peak cross sections for these two lines were found to be (39.4 plus or minus 7.9) x 10 to the -18th and (6.9 plus or minus 1.4) x 10 to the -18th, respectively. At low energies, excitation of the Ar II resonance line is dominated by an electron exchange transition.

  20. The Extreme-ultraviolet Emission from Sun-grazing Comets

    NASA Technical Reports Server (NTRS)

    Bryans, Paul; Pesnell, William D.

    2012-01-01

    The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory has observed two Sun-grazing comets as they passed through the solar atmosphere. Both passages resulted in a measurable enhancement of extreme-ultraviolet (EUV) radiance in several of the AIA bandpasses.We explain this EUV emission by considering the evolution of the cometary atmosphere as it interacts with the ambient solar atmosphere. Molecules in the comet rapidly sublimate as it approaches the Sun. They are then photodissociated by the solar radiation field to create atomic species. Subsequent ionization of these atoms produces a higher abundance of ions than normally present in the corona and results in EUV emission in the wavelength ranges of the AIA telescope passbands.

  1. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength

    NASA Astrophysics Data System (ADS)

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-08-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam.

  2. Extreme ultraviolet mask substrate surface roughness effects on lithography patterning

    SciTech Connect

    George, Simi; Naulleau, Patrick; Salmassi, Farhad; Mochi, Iacopo; Gullikson, Eric; Goldberg, Kenneth; Anderson, Erik

    2010-06-21

    In extreme ultraviolet lithography exposure systems, mask substrate roughness induced scatter contributes to LER at the image plane. In this paper, the impact of mask substrate roughness on image plane speckle is explicitly evaluated. A programmed roughness mask was used to study the correlation between mask roughness metrics and wafer plane aerial image inspection. We find that the roughness measurements by top surface topography profile do not provide complete information on the scatter related speckle that leads to LER at the image plane. We suggest at wavelength characterization by imaging and/or scatter measurements into different frequencies as an alternative for a more comprehensive metrology of the mask substrate/multilayer roughness effects.

  3. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength

    PubMed Central

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-01-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam. PMID:27501749

  4. Extreme ultraviolet spectra of highly ionized oxygen and fluorine

    NASA Technical Reports Server (NTRS)

    Pegg, D. J.; Griffin, P. M.; Haselton, H. H.; Laubert, R.; Mowat, J. R.; Thoe, R. S.; Peterson, R. S.; Sellin, I. A.

    1974-01-01

    The foil-excitation method has been used to study the extreme ultraviolet spectra of highly ionized oxygen and fluorine. Several previously unreported lines in heliumlike fluorine are reported and other newly reported lines in heliumlike oxygen have been measured to higher accuracy. Included in the measurements are certain heliumlike oxygen transitions of significance in interpretation of solar-flare spectral observations. The wavelength determinations are usually in good agreement with calculated results which includes relativistic corrections, but discrepancies arise when nonrelativistic calculations are used. A comparison of the present results and those recently obtained by theta-pinch and laser-induced plasma sources is made for both heliumlike and lithiumlike ions; a few discrepancies occur, with results in most cases in better agreement with relativistically corrected calculations. Certain unidentified lines in the spectra may be attributable to radiative transitions between quartet states of lithiumlike ions.

  5. Extreme ultraviolet response of a Tektronix 1024 x 1024 CCD

    NASA Astrophysics Data System (ADS)

    Moses, Daniel J.; Hochedez, Jean-Francois E.; Howard, Russell A.; Au, Benjamin D.; Wang, Dennis; Blouke, Morley

    1992-08-01

    The goal of the detector development program for the Solar and Heliospheric Spacecraft (SOHO) EUV Imaging Telescope (EIT) is an Extreme UltraViolet (EUV) CCD (Charge Coupled Device) camera. The Naval Research Lab (NRL) SOHO COD Group has developed a design for the EIT camera and is screening CCDs for flight application. Tektronix Inc. have fabricated 1024x1024 CCDs for the EIT program. As a part of the CCD screening effort the quantum efficiency (QE) of a prototype CCD has been measured in the NRL EUV laboratory over the wavelength range of 256 to 735 Angstroms. A simplified model has been applied to these QE measurements to illustrate the relevant physical processes that determine the performance of the detector.

  6. A Penning discharge source for extreme ultraviolet calibration

    NASA Technical Reports Server (NTRS)

    Finley, David S.; Jelinsky, Patrick; Bowyer, Stuart; Malina, Roger F.

    1986-01-01

    A Penning discharge lamp for use in the calibration of instruments and components for the extreme ultraviolet has been developed. This source is sufficiently light and compact to make it suitable for mounting on the movable slit assembly of a grazing incidence Rowland circle monochromator. Because this is a continuous discharge source, it is suitable for use with photon counting detectors. Line radiation is provided both by the gas and by atoms sputtered off the interchangeable metal cathodes. Usable lines are produced by species as highly ionized as Ne IV and Al V. The wavelength coverage provided is such that a good density of emission lines is available down to wavelengths as short as 100A. This source fills the gap between 100 and 300A, which is inadequately covered by the other available compact continuous radiation sources.

  7. THE EXTREME-ULTRAVIOLET EMISSION FROM SUN-GRAZING COMETS

    SciTech Connect

    Bryans, P.; Pesnell, W. D.

    2012-11-20

    The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory has observed two Sun-grazing comets as they passed through the solar atmosphere. Both passages resulted in a measurable enhancement of extreme-ultraviolet (EUV) radiance in several of the AIA bandpasses. We explain this EUV emission by considering the evolution of the cometary atmosphere as it interacts with the ambient solar atmosphere. Molecules in the comet rapidly sublimate as it approaches the Sun. They are then photodissociated by the solar radiation field to create atomic species. Subsequent ionization of these atoms produces a higher abundance of ions than normally present in the corona and results in EUV emission in the wavelength ranges of the AIA telescope passbands.

  8. Method for the protection of extreme ultraviolet lithography optics

    DOEpatents

    Grunow, Philip A.; Clift, Wayne M.; Klebanoff, Leonard E.

    2010-06-22

    A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.

  9. Ne-like ion lasers in the extreme ultraviolet region

    SciTech Connect

    Li, Y.; Pretzler, G.; Fill, E.E.

    1995-11-01

    We report strong {ital J}=0--1, 3{ital p}-3{ital s} lasing in Ne-like scandium, calcium, potassium, and chlorine at wavelengths ranging from 35.3 nm in scandium to 52.9 nm in chlorine. The experiments were carried out with the ASTERIX IV iodine laser using a 15% prepulse 5.2 ns before the main pulse. These results extend the range of laser plasma x-ray lasers into the extreme ultraviolet region. Gain lengths between 7 and 11 were measured for the different lines. The 38.3-nm laser in calcium lased at an intensity as low as 5{times}10{sup 12} W/cm{sup {minus}2}.

  10. Upgrade of absolute extreme ultraviolet diagnostic on J-TEXT.

    PubMed

    Zhang, X L; Cheng, Z F; Hou, S Y; Zhuang, G; Luo, J

    2014-11-01

    The absolute extreme ultraviolet (AXUV) diagnostic system is used for radiation observation on J-TEXT tokamak [J. Zhang, G. Zhuang, Z. J. Wang, Y. H. Ding, X. Q. Zhang, and Y. J. Tang, Rev. Sci. Instrum. 81, 073509 (2010)]. The upgrade of the AXUV system is aimed to improve the spatial resolution and provide a three-dimensional image on J-TEXT. The new system consists of 12 AXUV arrays (4 AXUV16ELG arrays, 8 AXUV20ELG arrays). The spatial resolution in the cross-section is 21 mm for the AXUV16ELG arrays and 17 mm for the AXUV20ELG arrays. The pre-amplifier is also upgraded for a higher signal to noise ratio. By upgrading the AXUV imaging system, a more accurate observation on the radiation information is obtained. PMID:25430327

  11. Upgrade of absolute extreme ultraviolet diagnostic on J-TEXT

    SciTech Connect

    Zhang, X. L.; Cheng, Z. F. Hou, S. Y.; Zhuang, G.; Luo, J.

    2014-11-15

    The absolute extreme ultraviolet (AXUV) diagnostic system is used for radiation observation on J-TEXT tokamak [J. Zhang, G. Zhuang, Z. J. Wang, Y. H. Ding, X. Q. Zhang, and Y. J. Tang, Rev. Sci. Instrum. 81, 073509 (2010)]. The upgrade of the AXUV system is aimed to improve the spatial resolution and provide a three-dimensional image on J-TEXT. The new system consists of 12 AXUV arrays (4 AXUV16ELG arrays, 8 AXUV20ELG arrays). The spatial resolution in the cross-section is 21 mm for the AXUV16ELG arrays and 17 mm for the AXUV20ELG arrays. The pre-amplifier is also upgraded for a higher signal to noise ratio. By upgrading the AXUV imaging system, a more accurate observation on the radiation information is obtained.

  12. Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy

    NASA Astrophysics Data System (ADS)

    Schmitz, Christoph; Wilson, Daniel; Rudolf, Denis; Wiemann, Carsten; Plucinski, Lukasz; Riess, Sally; Schuck, Martin; Hardtdegen, Hilde; Schneider, Claus M.; Tautz, F. Stefan; Juschkin, Larissa

    2016-06-01

    We report on the combination of a state-of-the-art energy-filtering photoemission electron microscope with an intense yet compact laboratory-based gas discharge extreme ultraviolet (EUV) light source. Using a photon energy of 71.7 eV from oxygen plasma (O5+ spectral line), we demonstrate element-selective photoelectron imaging in real space and band structure mapping in reciprocal space. Additionally, the high surface sensitivity of the EUV light was used to study the surface oxidation on islands of the phase-change material Ge1Sb2Te4 . The EUV light source allows the extension of spectromicroscopy, previously only feasible at synchrotron beamlines, to laboratory-based work.

  13. Normal incidence multilayer mirrors for extreme ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Stern, R. A.; Haisch, B. M.; Joki, E. G.; Catura, R. C.

    1984-01-01

    Sputtered multilayer coatings allow the use of normal incidence optics in the extreme ultraviolet (EUV) region below 500 A. Multilayer mirrors can be tailored to provide images at strong EUV lines in the sun and stars, in many cases making more efficient use of the telescope aperture than grazing incidence optics. Alternatively, the bandpass can be broadened at the expense of peak effective area, by varying the multilayer structure over the mirror surface. Such mirrors can also serve as optical elements in spectrographs for investigation of specific emission and absorption line complexes, and are self-filtering in that they reject nearby geocoronal and cosmic resonance line backgrounds. Current efforts at the Lockheed Palo Alto Research Laboratory in the design, fabrication, and testing of EUV multilayer mirrors are discussed. This program includes the design and fabrication of normal incidence EUV multilayer mirrors, and the deposition of multilayers on lacquer-coated substrates.

  14. Extreme ultraviolet spectrograph ATM experiment S082B

    NASA Technical Reports Server (NTRS)

    Bartoe, J.-D. F.; Brueckner, G. E.; Purcell, J. D.; Tousey, R.

    1977-01-01

    The extreme-ultraviolet double-dispersion photographic spectrograph for the Apollo Telescope Mount (ATM) experiment S082B on Skylab is described. Novel features were the use of a predisperser grating with a ruling whose spacing varied approximately linearly with distance for the purpose of increasing the instrument speed by reducing the astigmatism and a photoelectric servosystem to stabilize to 1 sec of arc the solar image at various near-limb positions. The 970-3940-A range was covered in two sections with effective resolving power of approximately 30,000 from 1100 A to 1970 A. The spatial resolution was 2 x 60 solar sec of arc. During the Skylab mission 6400 exposures were made with the instrument pointed by an astronaut at selected and recorded solar positions.

  15. Defect formation in single layer graphene under extreme ultraviolet irradiation

    NASA Astrophysics Data System (ADS)

    Gao, A.; Zoethout, E.; Sturm, J. M.; Lee, C. J.; Bijkerk, F.

    2014-10-01

    We study extreme ultraviolet (EUV) radiation induced defects in single-layer graphene. Two mechanisms for inducing defects in graphene were separately investigated: photon induced chemical reactions between graphene and background residual gases, and breaking sp2 bonds, due to photon and/or photoelectrons induced bond cleaving. Raman spectroscopy shows that D peak intensities grow after EUV irradiation with increasing water partial pressure in the exposure chamber. Temperature-programmed desorption (TPD) experiments prove that EUV radiation results in water dissociation on the graphene surface. The oxidation of graphene, caused by water dissociation, is triggered by photon and/or photoelectron induced dissociation of water. Our studies show that the EUV photons break the sp2 bonds, forming sp3 bonds, leading to defects in graphene.

  16. At-wavelength interferometry of extreme ultraviolet lithographic optics

    SciTech Connect

    Lee, Sang Hun; Naulleau, Patrick; Goldberg, Kenneth; Medecki, Hector; Bresloff, Cynthia; Chang, Chang; Attwood, David; Bokor, Jeffrey; Chang, Chang; Attwood, David; Bokor, Jeffrey Tejnil, Edita

    1998-11-01

    A phase-shifting point diffraction interferometer (PS/PDI) has recently been developed to evaluate optics for extreme ultraviolet (EUV) projection lithography systems. The interferometer has been implemented at the Advanced Light Source at Lawrence Berkeley National Laboratory and is currently being used to test experimental EUV Schwarzschild objectives. Recent PS/PDI measurements indicate these experimental objectives to have wavefront errors on the order of 0.1 waves ({approximately}1 nm at a wavelength of 13.4 nm) rms. These at-wavelength measurements have also revealed the multilayer phase effects, demonstrating the sensitivity and importance of EUV characterization. The measurement precision of the PS/PDI has been experimentally determined to be better than 0.01 waves. Furthermore, a systematic-error-limited absolute measurement accuracy of 0.004 waves has been demonstrated. {copyright} {ital 1998 American Institute of Physics.}

  17. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength.

    PubMed

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-01-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam. PMID:27501749

  18. The extreme ultraviolet spectroscope for planetary science, EXCEED

    NASA Astrophysics Data System (ADS)

    Yoshioka, K.; Murakami, G.; Yamazaki, A.; Tsuchiya, F.; Kagitani, M.; Sakanoi, T.; Kimura, T.; Uemizu, K.; Uji, K.; Yoshikawa, I.

    2013-09-01

    The extreme ultraviolet spectroscope EXtrem ultraviolet spetrosCope for ExosphEric Dynamics (EXCEED) on board the SPRINT-A mission will be launched in the summer of 2013 by the new Japanese solid propulsion rocket Epsilon as its first attempt, and it will orbit around the Earth with an orbital altitude of around 1000 km. EXCEED is dedicated to and optimized for observing the terrestrial planets Mercury, Venus and Mars, as well as Jupiter for several years. The instrument consists of an off axis parabolic entrance mirror, switchable slits with multiple filters and shapes, a toroidal grating, and a photon counting detector, together with a field of view guiding camera. The design goal is to achieve a large effective area but with high spatial and spectral resolution. In this paper, the performance of each optical component will be described as determined from the results of test evaluation of flight models. In addition, the results of the optical calibration of the overall instrument are also shown. As a result, the spectral resolution of EXCEED is found to be 0.3-0.5 nm Full Width at Half Maximum (FWHM) over the entire spectral band (52-148 nm) and the spatial resolution achieve was 10". The evaluated effective area is around 3 cm2. Based on these specifications, the possibility of EXCEED detecting atmospheric ions or atoms around Mercury, Venus, and Mars will be discussed. In addition, we estimate the spectra that might be detected from the Io plasma torus around Jupiter for various hypothetical plasma parameters.

  19. Impurity Monitoring on NSTX-U with Three New Extreme Ultraviolet Spectrometers

    NASA Astrophysics Data System (ADS)

    Weller, M. E.; Beiersdorfer, P.; Soukhanovskii, V. A.; Magee, E. W.; Rognlien, T. D.; Stratton, B. C.

    2015-11-01

    The National Spherical Torus Experiment - Upgrade (NSTX-U) is a significant advancement from NSTX offering increased toroidal field, plasma current, and neutral beam injector input power. Due to these improvements generating more intense plasma conditions, impurities penetrating into the core could also be enhanced, despite efforts to improve wall conditioning (bake out, boronization, and lithium evaporation). To monitor and study these impurities, three extreme ultraviolet (EUV) spectrometers have been implemented on NSTX-U. All three are flat field grazing incident spectrometers capable of capturing time-resolved data to about 5.0 ms. Two of the spectrometers, the X-ray and Extreme Ultraviolet Spectrometer (XEUS, 5 - 65 Å) the Long-Wavelength and Extreme Ultraviolet Spectrometer (LoWEUS, 190 - 440 Å) were previously implemented on NSTX. The third has been dubbed the Metal Monitor and Lithium Spectrometer Assembly (MonaLisa, 50 - 220 Å). A new laser blow-off (LBO) system has also been developed in conjuncture with the spectrometers to introduce low and high-Z elements to study core impurity transport. The three spectrometers, along with the new LBO system, provide a unique opportunity to attain highly resolved spectra of impurities from 5 - 440 Å with time-resolution. This work was performed under the auspices of the US Department of Energy under DE-AC52-07NA27344 and DE-AC02- 09CH11466.

  20. Bright high-repetition-rate source of narrowband extreme-ultraviolet harmonics beyond 22 eV

    PubMed Central

    Wang, He; Xu, Yiming; Ulonska, Stefan; Robinson, Joseph S.; Ranitovic, Predrag; Kaindl, Robert A.

    2015-01-01

    Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. Here, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 1013 s−1 is generated at 22.3 eV, with 5 × 10−5 conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications. PMID:26067922

  1. Bright high-repetition-rate source of narrowband extreme-ultraviolet harmonics beyond 22 eV

    SciTech Connect

    Wang, He; Xu, Yiming; Ulonska, Stefan; Robinson, Joseph S.; Ranitovic, Predrag; Kaindl, Robert A.

    2015-06-11

    Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. In this article, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 1013 s-1 is generated at 22.3 eV, with 5 × 10-5 conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Finally, spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications.

  2. An operations and command systems for the extreme ultraviolet explorer

    NASA Technical Reports Server (NTRS)

    Muscettola, Nicola; Korsmeyer, David J.; Olson, Eric C.; Wong, Gary

    1994-01-01

    About 40% of the budget of a scientific spacecraft mission is usually consumed by Mission Operations & Data Analysis (MO&DA) with MO driving these costs. In the current practice, MO is separated from spacecraft design and comes in focus relatively late in the mission life cycle. As a result, spacecraft may be designed that are very difficult to operate. NASA centers have extensive MO expertise but often lessons learned in one mission are not exploited for other parallel or future missions. A significant reduction of MO costs is essential to ensure a continuing and growing access to space for the scientific community. We are addressing some of these issues with a highly automated payload operations and command system for an existing mission, the Extreme Ultraviolet Explorer (EUVE). EUVE is currently operated jointly by the Goddard Space Flight Center (GSFC), responsible for spacecraft operations, and the Center for Extreme Ultraviolet Astrophysics (CEA) of the University of California, Berkeley, which controls the telescopes and scientific instruments aboard the satellite. The new automated system is being developed by a team including personnel from the NASA Ames Research Center (ARC), the Jet Propulsion Laboratory (JPL) and the Center for EUV Astrophysics (CEA). An important goal of the project is to provide AI-based technology that can be easily operated by nonspecialists in AI. Another important goal is the reusability of the techniques for other missions. Models of the EUVE spacecraft need to be built both for planning/scheduling and for monitoring. In both cases, our modeling tools allow the assembly of a spacecraft model from separate sub-models of the various spacecraft subsystems. These sub-models are reusable; therefore, building mission operations systems for another small satellite mission will require choosing pre-existing modules, reparametrizing them with respect to the actual satellite telemetry information, and reassembling them in a new model. We

  3. Properites of ultrathin films appropriate for optics capping layers in extreme ultraviolet lithography (EUVL)

    SciTech Connect

    Bajt, S; Edwards, N V; Madey, T E

    2007-06-25

    The contamination of optical surfaces by irradiation shortens optics lifetime and is one of the main concerns for optics used in conjunction with intense light sources, such as high power lasers, 3rd and 4th generation synchrotron sources or plasma sources used in extreme ultraviolet lithography (EUVL) tools. This paper focuses on properties and surface chemistry of different materials, which as thin layers, could be used as capping layers to protect and extend EUVL optics lifetime. The most promising candidates include single element materials such as ruthenium and rhodium, and oxides such as TiO{sub 2} and ZrO{sub 2}.

  4. Coherent extreme ultraviolet light amplification by strong-field-enhanced forward scattering.

    PubMed

    Serrat, Carles

    2013-09-27

    We theoretically study the response of He atoms exposed simultaneously to an intense IR pulse and a weak extreme ultraviolet (XUV) pulse with photon energies far from the principal atomic He resonances. We find that XUV forward scattering from the nonstationary electronic wave packet promoted by the intense IR driving field is strongly enhanced as compared with the normal weak scattering from bound or free electrons. Based on this effect, we predict that large amplification of XUV radiation can be achieved in the cutoff spectral region of high-harmonic generation in He gas. PMID:24116781

  5. Contamination control approach for the Extreme Ultraviolet Explorer satellite instrumentation

    NASA Technical Reports Server (NTRS)

    Mrowka, Stan; Jelinsky, Sharon; Jelinsky, Patrick; Malina, Roger F.

    1987-01-01

    The Extreme Ultraviolet Explorer will perform an all-sky survey and spectroscopic observations over the wavelength range 80-900A. Hydrocarbon and particulate contamination will potentially affect the throughput and signal to noise ratio of the signal detected by the instruments. A witness sample program is here used to investigate and monitor the effects of specific contaminants on EUV reflectivity. Witness samples were intentionally contaminated with thin layers of pump oil. An oil layer 150 A thick was applied and found to evaporate over 8 hours. The EUV reflectivity and imaging properties were then measured and found to be acceptable for grazing angles between 5 and 30 deg. In a second test, layers 500 A thick were deposited and then allowed to evaporate in vacuum; once the oil had evaporated to at least 350 A, the final sample reflectivity was degraded less than 10 percent, but the image was degraded severely by scattering. An outline of the contamination control program is also presented.

  6. Kr photoionized plasma induced by intense extreme ultraviolet pulses

    NASA Astrophysics Data System (ADS)

    Bartnik, A.; Wachulak, P.; Fiedorowicz, H.; Skrzeczanowski, W.

    2016-04-01

    Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.

  7. Extreme Ultraviolet Explorer Right Angle Program observations of cool stars

    NASA Astrophysics Data System (ADS)

    Christian, D. J.; Drake, J. J.; Mathioudakis, M.

    1998-01-01

    The Extreme Ultraviolet Explorer (EUVE) Right Angle Program (RAP) obtains photometric data in four bands centered at 100 (Lexan/B), 200 (Al/Ti/C), 400 (Ti/Sb/Al), and 550 (Sn/SiO) during pointed spectroscopic observations. RAP observations are up to 20 times more sensitive than those in the EUVE all-sky survey. We present RAP observations of two dozen late-type stars. We derive surface fluxes from the Lexan/B and Al/Ti/C count rates and cataloged ROSAT Position Sensitive Proportional Counter (PSPC) data. The EUVE surface fluxes are reasonably correlated with surface fluxes calculated from PSPC measurements. The time variability of the sources has been examined. Most of the sources show no significant variability at the 99 percent confidence level. Flares were detected from the K7 V star Melotte 25 VA 334, the K3 V star V834 Tau (HD 29697), and the K3 + K8 Hyades binary BD +22669. The BD +22669 count rate at the peak of the flare is a factor of 6 higher than the quiescent count rate, with a peak Lexan/B luminosity of 7.9 1029 ergs/s. The V834 Tau flare was detected in both Lexan/B and Al/Ti/C bands. The peak luminosity of the flare is 1.6 1029 and 8 1028 ergs/s for Lexan/B and Al/Ti/C, respectively.

  8. Imaging performance and test of extreme ultraviolet telescope

    NASA Astrophysics Data System (ADS)

    Yang, Lin; Cui, Tiangang; Chen, Bo

    2009-08-01

    The Extreme Ultraviolet Telescope (EUT) is composed of a set of four individual normal incidence multilayer-coated telescopes that obtained selected spectrum bandpass (131 A-304 A) of the solar atmosphere. Before the launch, it is necessary to calibrate the imaging performance of EUT. We build a test system for EUT by two ways. Resolution test was performed using 1951 Standard Air Force High Resolution Test target, and the optical resolution limits down to 0.96arc-second at 404.7nm. A pinhole as a target placed on the focal point of a collimator is illuminated mercury lump. The intensity distribution is obtained by knife-edge scanning with low noise photon-counting detector. The slope of the knife-edge scan is equal to the value of the line spread function (LSF). Based on these measurement, we calculate the e modulation transfer function, which is highly closed to the simulation result of zemax. The experiment result indicates that the test system works well. For further work, the working wavelength test will be done with the help of those experiment results.

  9. Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

    NASA Astrophysics Data System (ADS)

    Passarelli, James; Murphy, Michael; Re, Ryan Del; Sortland, Miriam; Hotalen, Jodi; Dousharm, Levi; Fallica, Roberto; Ekinci, Yasin; Neisser, Mark; Freedman, Daniel A.; Brainard, Robert L.

    2015-10-01

    We have developed organometallic carboxylate compounds [RnM)] capable of acting as negative-tone extreme ultraviolet (EUV) resists. The most sensitive of these resists contain antimony, three R-groups and two carboxylate groups, and carboxylate groups with polymerizable olefins (e.g., acrylate, methacrylate, or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of the molecules of the type RnM) where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O2CR‧). The sensitivity of these resists was evaluated using Emax or dose to maximum resist thickness after exposure and development. We found that the greatest predictor of sensitivity of the RnSb) resists is their level of polymerizable olefins. We mathematically define the polymerizable olefin loading (POL) as the ratio of the number of olefins versus the number of nonhydrogen atoms. Linear and log plots of Emax versus POL for a variety of molecules of the type R3Sb) lend insight into the behavior of these resists.

  10. Characterization of electrostatic chucks for extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Mulholland, Tom C.; Zeuske, Jacob R.; Vukkadala, Pradeep; Engelstad, Roxann L.

    2009-03-01

    The use of an electrostatic chuck to support and flatten an extreme ultraviolet (EUV) mask during scanning exposure will be a critical component to meet the stringent requirements on image placement errors in the sub-30-nm regime. Consequently, the ability to predict the response of the mask during e-chucking is necessary for the design and implementation of the e-chuck system. This research focuses on characterizing the coefficient of friction between the EUV reticle and the dielectric material of the chuck. A customized tool was constructed to test chuck and reticle samples both in air and in a vacuum chamber. Studies were conducted to identify the friction coefficient at various chucking pressures and to examine the effects of wear caused by repeated measurements on the same location of the reticle surface. All experiments were performed in a cleanroom environment. Results of the friction testing illustrate the range of values to expect for typical EUV reticles and chucks. Finite element (FE) modeling was then used to illustrate the effects of friction on the overall capability of the chuck to flatten the mask. Additional FE simulations demonstrated the magnitude of the friction force needed to ensure that the reticle would not slip during the acceleration / deceleration loading seen in the scanning exposure process.

  11. Four-mirror extreme ultraviolet (EUV) lithography projection system

    DOEpatents

    Cohen, Simon J; Jeong, Hwan J; Shafer, David R

    2000-01-01

    The invention is directed to a four-mirror catoptric projection system for extreme ultraviolet (EUV) lithography to transfer a pattern from a reflective reticle to a wafer substrate. In order along the light path followed by light from the reticle to the wafer substrate, the system includes a dominantly hyperbolic convex mirror, a dominantly elliptical concave mirror, spherical convex mirror, and spherical concave mirror. The reticle and wafer substrate are positioned along the system's optical axis on opposite sides of the mirrors. The hyperbolic and elliptical mirrors are positioned on the same side of the system's optical axis as the reticle, and are relatively large in diameter as they are positioned on the high magnification side of the system. The hyperbolic and elliptical mirrors are relatively far off the optical axis and hence they have significant aspherical components in their curvatures. The convex spherical mirror is positioned on the optical axis, and has a substantially or perfectly spherical shape. The spherical concave mirror is positioned substantially on the opposite side of the optical axis from the hyperbolic and elliptical mirrors. Because it is positioned off-axis to a degree, the spherical concave mirror has some asphericity to counter aberrations. The spherical concave mirror forms a relatively large, uniform field on the wafer substrate. The mirrors can be tilted or decentered slightly to achieve further increase in the field size.

  12. Extreme ultraviolet observations from the voyager 2 encounter with saturn.

    PubMed

    Sandel, B R; Shemansky, D E; Broadfoot, A L; Holberg, J B; Smith, G R; McConnell, J C; Strobel, D F; Atreya, S K; Donahue, T M; Moos, H W; Hunten, D M; Pomphrey, R B; Linick, S

    1982-01-29

    Combined analysis of helium (584 angstroms) airglow and the atmospheric occultations of the star delta Scorpii imply a vertical mixing parameter in Saturn's upper atmosphere of K (eddy diffusion coefficient) approximately 8 x 10(7) square centimeters per second, an order of magnitude more vigorous than mixing in Jupiter's upper atmosphere. Atmospheric H(2) band absorption of starlight yields a preliminary temperature of 400 K in the exosphere and a temperature near the homopause of approximately 200 K. The energy source for the mid-latitude H(2) band emission still remains a puzzle. Certain auroral emissions can be fully explained in terms of electron impact on H(2), and auroral morphology suggests a link between the aurora and the Saturn kilometric radiation. Absolute optical depths have been determined for the entire C ring andparts of the A and B rings. A new eccentric ringlet has been detected in the C ring. The extreme ultraviolet reflectance of the rings is fairly uniform at 3.5 to 5 percent. Collisions may control the distribution of H in Titan's H torus, which has a total vertical extent of approximately 14 Saturn radii normal to the orbit plane. PMID:17771276

  13. Smoothing of Diamond-Turned Substrates for Extreme Ultraviolet Illuminators

    SciTech Connect

    Soufli, R; Spiller, E; Schmidt, M A; Robinson, J C; Baker, S L; Ratti, S; Johnson, M A; Gullikson, E M

    2003-11-13

    Condenser optics in extreme ultraviolet lithography (EUVL) systems are subjected to frequent replacement as they are positioned close to the illumination source, where increased heating and contamination occur. In the case of aspherical condenser elements made by optical figuring/finishing, their replacement can be very expensive (several hundred thousand dollars). One approach to this problem would be to manufacture inexpensive illuminator optics that meet all required specifications and could be replaced at no substantial cost. Diamond-turned metal substrates are a factor of 100 less expensive than conventional aspherical substrates but have insufficient finish, leading to unacceptably low EUV reflectance after multilayer coating. In this work it is shown that, by applying a smoothing film prior to multilayer coating, the high spatial frequency roughness of a diamond-turned metal substrate is reduced from 1.76 to 0.27 nm rms while the figure slope error is maintained at acceptable levels. Metrology tests performed at various stages of the fabrication of the element demonstrated that it satisfied all critical figure and finish specifications as illuminator. Initial experimental results on the stability and performance of the optic under a real EUVL plasma source environment show no accelerated degradation when compared to conventional substrates.

  14. Laser produced plasma for efficient extreme ultraviolet light sources

    SciTech Connect

    Donnelly, Tony; Cummins, Thomas; O' Gorman, Colm; Li Bowen; Harte, Colm S.; O'Reilly, Fergal; Sokell, Emma; Dunne, Padraig; O'Sullivan, Gerry

    2012-05-25

    Extreme ultraviolet emission from laser produced plasma and their relevance to EUV source development is discussed. The current state of the field for Sn LPP sources operating at 13.5 nm is described and initial results are given for EUV emission from CO{sub 2} laser irradiation of a bulk Sn target. A maximum conversion efficiency of 1.7% has been measured and the influence of the CO{sub 2} laser temporal profile on the CE is discussed. A double pulse irradiation scheme is shown to increase CE up to a maximum value of 2.1% for an optimum prepulse - pulse delay of 150 ns. The emergence of a new EUVL source wavelength at 6.7 nm based on Gd and Tb LPPs has been outlined. An initial experiment investigating picosecond laser irradiation as a means to produce strong 6.7 nm emission from a Gd{sub 2}O{sub 3} target has been performed and verified.

  15. The Extreme Ultraviolet (EUV) Instrument for the MAVEN Mission

    NASA Technical Reports Server (NTRS)

    Chamberlin, Phillip C.

    2012-01-01

    The Mars Atmosphere and Volatile Evolution Mission (MAVEN) will explore the variability in the planet's upper atmosphere and ionosphere that is dominated by interactions with the sun, specifically the high-energy photons in the soft X-ray and extreme ultraviolet wavelengths as well as interactions with the solar wind. Scientists will use MAVEN data to determine the current loss rate of volatile compounds from the Mars atmosphere, then extrapolate back in time in order to give historical estimations of state of the Mars atmosphere and climate, its ability to sustain liquid water, and the potential for the Martian habitability. The EUV instrument is critical in measuring the Space Weather driver of this atmospheric variability. It will directly observe a three EUV wavelength ranges and their variability due to solar flares (time scales of seconds to hours) as well as active region evolution (months), which will then act as proxies for a model to determine the entire 0.1-200 nm solar spectrum at all times during the MAVEN mission. These EUV measurements and models results will compliment the other instruments that will provide direct in-situ as well as remote sensing observations of the Martian atmospheric response to this solar driver. This presentation will be an introduction of this instrument and its science measurements and goals to the larger community, as well as a status report on its progress.

  16. The joint astrophysical plasmadynamic experiment extreme ultraviolet spectrometer: resolving power

    NASA Astrophysics Data System (ADS)

    Berendse, F. B.; Cruddace, R. G.; Kowalski, M. P.; Yentis, D. J.; Hunter, W. R.; Fritz, G. G.; Siegmund, O.; Heidemann, K.; Lenke, R.; Seifert, A.; Barbee, T. W., Jr.

    2006-06-01

    The Joint astrophysical Plasmadynamic EXperiment (J-PEX) is a high-resolution extreme ultraviolet (EUV) spectrometer (220-245 Å) used for the study of white dwarf atmospheres. Significant improvements have been achieved in both the normal-incidence gratings and the focal-plane detector since its first successful sounding rocket flight in 2001. The spherical laminar gratings have been replaced by paraboloidal gratings. The substrates of the new gratings have measured slope errors less than 0.35 arcsec. The gratings were recorded holographically and the rulings transferred into the silica substrates by ion etching. This procedure was followed by polymer overcoat to reduce the blaze angle of the groove profile. The detector uses microchannel plates with 6 μm pores and a cross-strip anode, providing 17.9 μm resolution in the dispersion direction. The detector employs a KBr photocathode with a projected efficiency of 0.24 at 256 Å. Using ray tracing simulations, we predict the resolving power expected from the spectrometer during upcoming EUV calibrations with a He II discharge source.

  17. Expected extreme ultraviolet spectrum of the lunar surface

    SciTech Connect

    Edwards, B.C.; Priedhorsky, W.C.; Smith, B.W. )

    1991-11-01

    The moon was recently observed to be a source of very soft x-ray emission. The emission was most intense at wavelengths longer than 62 {angstrom} and was attributed to Thomson scattering of solar x-rays. This observation prompted the authors to study the emissions expected from the lunar surface in the wavelength range between 90 and 500 {angstrom}. Photons in this wavelength range scatter inefficiently. Instead, the solar x-rays are absorbed in the first several microns of lunar regolith. The absorbed x-rays can excite the surface elements and result in fluorescent emission. The authors find that much of the L- and M-shell extreme ultraviolet fluorescence, in the wavelength range between 90 and 500 {angstrom}, have higher peak intensities than the scattered solar spectrum. The total integrated fluorescent emission is also higher than the total scattered solar radiation. The L-shell fluorescent radiation can be an indicator of the surface abundances of Si, Al, Mg and other major lunar elements.

  18. Low Extreme-ultraviolet Luminosities Impinging on Protoplanetary Disks

    NASA Astrophysics Data System (ADS)

    Pascucci, I.; Ricci, L.; Gorti, U.; Hollenbach, D.; Hendler, N. P.; Brooks, K. J.; Contreras, Y.

    2014-11-01

    The amount of high-energy stellar radiation reaching the surface of protoplanetary disks is essential to determine their chemistry and physical evolution. Here, we use millimetric and centimetric radio data to constrain the extreme-ultraviolet (EUV) luminosity impinging on 14 disks around young (~2-10 Myr) sun-like stars. For each object we identify the long-wavelength emission in excess to the dust thermal emission, attribute that to free-free disk emission, and thereby compute an upper limit to the EUV reaching the disk. We find upper limits lower than 1042 photons s-1 for all sources without jets and lower than 5 × 1040 photons s-1 for the three older sources in our sample. These latter values are low for EUV-driven photoevaporation alone to clear out protoplanetary material in the timescale inferred by observations. In addition, our EUV upper limits are too low to reproduce the [Ne II] 12.81 μm luminosities from three disks with slow [Ne II]-detected winds. This indicates that the [Ne II] line in these sources primarily traces a mostly neutral wind where Ne is ionized by 1 keV X-ray photons, implying higher photoevaporative mass loss rates than those predicted by EUV-driven models alone. In summary, our results suggest that high-energy stellar photons other than EUV may dominate the dispersal of protoplanetary disks around sun-like stars.

  19. Extreme ultraviolet multilayer defect analysis and geometry reconstruction

    NASA Astrophysics Data System (ADS)

    Xu, Dongbo; Evanschitzky, Peter; Erdmann, Andreas

    2016-01-01

    This paper proposes a method for the characterization of multilayer defects from extreme ultraviolet (EUV) projection images at different focus positions. The transport-of-intensity equation is applied to retrieve the phase distribution of the reflected light in the vicinity of the defect. The defect-induced intensity and phase modifications and their dependency from defect geometry parameters are analyzed by several selected optical properties of multilayer defect. To reconstruct the defect geometry parameters from the intensity and phase of a defect, a principal component analysis (PCA) is employed to parameterize the intensity and phase distributions into principal component coefficients. In order to construct the base functions of the PCA, a combination of a reference multilayer defect and appropriate pupil filters is introduced to obtain the designed sets of intensity and phase distributions. Finally, an artificial neural network is applied to correlate the principal component coefficients of the intensity and the phase of the defect with the defect geometry parameters and to reconstruct the unknown defect geometry parameters. The performance of the proposed approach is evaluated both for mask blank defects and for defects in the vicinity of an absorber pattern.

  20. Extreme-ultraviolet ultrafast ARPES at high repetition rates

    NASA Astrophysics Data System (ADS)

    Buss, Jan; Wang, He; Xu, Yiming; Stoll, Sebastian; Zeng, Lingkun; Ulonska, Stefan; Denlinger, Jonathan; Hussain, Zahid; Jozwiak, Chris; Lanzara, Alessandra; Kaindl, Robert

    Time- and angle-resolved photoemission spectroscopy (trARPES) represents a powerful approach to resolve the electronic structure and quasiparticle dynamics in complex materials, yet is often limited in either momentum space (incident photon energy), probe sensitivity (pulse repetition rate), or energy resolution. We demonstrate a novel table-top trARPES setup that combines a bright 50-kHz source of narrowband, extreme ultraviolet (XUV) pulses at 22.3 eV with UHV photoemission instrumentation to sensitively access dynamics for a large momentum space. The output of a high-power Ti:sapphire amplifier is split to provide the XUV probe and intense photoexcitation (up to mJ/cm2) . A vacuum beamline delivers spectral and flux characterization, differential pumping, as well as XUV beam steering and toroidal refocusing onto the sample with high incident flux of 3x1011 ph/s. Photoemission studies are carried out in a customized UHV chamber equipped with a hemispherical analyzer (R4000), six-axis sample cryostat, and side chambers for sample loading, storage and preparation. An ARPES energy resolution down to 70 meV with the direct XUV output is demonstrated. We will discuss initial applications of this setup including Fermi surface mapping and trARPES of complex materials.

  1. Extreme and far ultraviolet astronomy from Voyagers 1 and 2

    NASA Technical Reports Server (NTRS)

    Holberg, J. B.

    1990-01-01

    The instrumental characteristics, observational capabilities and scientific results of the Voyager 1 and 2 ultraviolet spectrometers are reviewed. These instruments provide current and ongoing access to low resolution spectra for a wide variety of astronomical sources in the 500 to 1700 A band. Observations of the brightest OB stars and hot subluminous stars as faint as V = 15 mag, are possible. In the EUV, at wavelengths shortward of 900 A, several new sources have been detected and a host of potential sources ruled out. In the far UV, particularly at wavelengths between 900 and 1200 A, Voyager is capable of observing a wide range of stellar and non-stellar sources. Such observations can often provide a valuable complement to IUE and other data sets at longer wavelengths. The Voyager spectrometers have proved remarkably stable photon counting instruments, capable of extremely long integration times. The long integration times, relatively large field of view, and location in the outer solar system also provide an ideal platform for observations of sources of faint diffuse emission, such as nebulae and the general sky background.

  2. Low extreme-ultraviolet luminosities impinging on protoplanetary disks

    SciTech Connect

    Pascucci, I.; Hendler, N. P.; Ricci, L.; Gorti, U.; Hollenbach, D.; Brooks, K. J.; Contreras, Y.

    2014-11-01

    The amount of high-energy stellar radiation reaching the surface of protoplanetary disks is essential to determine their chemistry and physical evolution. Here, we use millimetric and centimetric radio data to constrain the extreme-ultraviolet (EUV) luminosity impinging on 14 disks around young (∼2-10 Myr) sun-like stars. For each object we identify the long-wavelength emission in excess to the dust thermal emission, attribute that to free-free disk emission, and thereby compute an upper limit to the EUV reaching the disk. We find upper limits lower than 10{sup 42} photons s{sup –1} for all sources without jets and lower than 5 × 10{sup 40} photons s{sup –1} for the three older sources in our sample. These latter values are low for EUV-driven photoevaporation alone to clear out protoplanetary material in the timescale inferred by observations. In addition, our EUV upper limits are too low to reproduce the [Ne II] 12.81 μm luminosities from three disks with slow [Ne II]-detected winds. This indicates that the [Ne II] line in these sources primarily traces a mostly neutral wind where Ne is ionized by 1 keV X-ray photons, implying higher photoevaporative mass loss rates than those predicted by EUV-driven models alone. In summary, our results suggest that high-energy stellar photons other than EUV may dominate the dispersal of protoplanetary disks around sun-like stars.

  3. Imaging characteristics of the Extreme Ultraviolet Explorer microchannel plate detectors

    NASA Technical Reports Server (NTRS)

    Vallerga, J. V.; Kaplan, G. C.; Siegmund, O. H. W.; Lampton, M.; Malina, R. F.

    1989-01-01

    The Extreme Ultraviolet Explorer (EUVE) satellite will conduct an all-sky survey over the wavelength range from 70 A to 760 A using four grazing-incidence telescopes and seven microchannel-plate (MCP) detectors. The imaging photon-counting MCP detectors have active areas of 19.6 cm2. Photon arrival position is determined using a wedge-and-strip anode and associated pulse-encoding electronics. The imaging characteristics of the EUVE flight detectors are presented including image distortion, flat-field response, and spatial differential nonlinearity. Also included is a detailed discussion of image distortions due to the detector mechanical assembly, the wedge-and-strip anode, and the electronics. Model predictions of these distortions are compared to preflight calibration images which show distortions less than 1.3 percent rms of the detector diameter of 50 mm before correction. The plans for correcting these residual detector image distortions to less than 0.1 percent rms are also presented.

  4. Extreme Ultraviolet Spectra of Solar Flares from the Extreme Ultraviolet Spectroheliograph SPIRIT Onboard the CORONAS-F Satellite

    NASA Astrophysics Data System (ADS)

    Shestov, S.; Reva, A.; Kuzin, S.

    2014-01-01

    We present detailed extreme ultraviolet (EUV) spectra of four large solar flares: M5.6, X1.3, X3.4, and X17 classes in the spectral ranges 176-207 Å and 280-330 Å. These spectra were obtained by the slitless spectroheliograph SPIRIT onboard the CORONAS-F satellite. To our knowledge, these are the first detailed EUV spectra of large flares obtained with a spectral resolution of ~0.1 Å. We performed a comprehensive analysis of the obtained spectra and provide identification of the observed spectral lines. The identification was performed based on the calculation of synthetic spectra (the CHIANTI database was used), with simultaneous calculations of the differential emission measure (DEM) and density of the emitting plasma. More than 50 intense lines are present in the spectra that correspond to a temperature range of T = 0.5-16 MK most of the lines belong to Fe, Ni, Ca, Mg, and Si ions. In all the considered flares, intense hot lines from Ca XVII, Ca XVIII, Fe XX, Fe XXII, and Fe XXIV are observed. The calculated DEMs have a peak at T ~ 10 MK. The densities were determined using Fe XI-Fe XIII lines and averaged 6.5 × 109 cm-3. We also discuss the identification, accuracy, and major discrepancies of the spectral line intensity prediction.

  5. Extreme ultraviolet spectra of solar flares from the extreme ultraviolet spectroheliograph SPIRIT onboard the CORONAS-F satellite

    SciTech Connect

    Shestov, S.; Kuzin, S.; Reva, A.

    2014-01-01

    We present detailed extreme ultraviolet (EUV) spectra of four large solar flares: M5.6, X1.3, X3.4, and X17 classes in the spectral ranges 176-207 Å and 280-330 Å. These spectra were obtained by the slitless spectroheliograph SPIRIT onboard the CORONAS-F satellite. To our knowledge, these are the first detailed EUV spectra of large flares obtained with a spectral resolution of ∼0.1 Å. We performed a comprehensive analysis of the obtained spectra and provide identification of the observed spectral lines. The identification was performed based on the calculation of synthetic spectra (the CHIANTI database was used), with simultaneous calculations of the differential emission measure (DEM) and density of the emitting plasma. More than 50 intense lines are present in the spectra that correspond to a temperature range of T = 0.5-16 MK; most of the lines belong to Fe, Ni, Ca, Mg, and Si ions. In all the considered flares, intense hot lines from Ca XVII, Ca XVIII, Fe XX, Fe XXII, and Fe XXIV are observed. The calculated DEMs have a peak at T ∼ 10 MK. The densities were determined using Fe XI-Fe XIII lines and averaged 6.5 × 10{sup 9} cm{sup –3}. We also discuss the identification, accuracy, and major discrepancies of the spectral line intensity prediction.

  6. Spectroscopy of the far and extreme ultraviolet dayglow

    NASA Astrophysics Data System (ADS)

    Bowers, C. W.

    Researchers have designed, built and flown in a sounding rocket payload, a spectrograph with approx. 2 angstrom resolution from 850 angstroms to 1850 angstroms obtaining the highest resolution, broad wavelength coverage UV dayglow spectrum to date. This instrument utilizes a newly developed photon counting detector consisting of an ultraviolet-to-visible-light image intensifier with two microchannel plates in a tandem arrangement followed by a phosphor coated on the face of a fiber optics output bundle. Light generated in the phosphor by electron pulses produced by the MCP stack is transmitted to photodiode array with 1024 independent photodiodes. The broad light pulses generated by the intensifier were detected by the photodiode array. This flight data was transmitted to the ground and centroided, recovering the spectrograph resolution of approx. 2 angstroms. The vacuum spectrograph contains an osmium coated holographic f/2 concave diffraction grating, baffled to f/4 for flight. A movable slit wheel mechanism provides a vacuum seal, which is broken during flight as the entrance slit is moved into position. The UV dayglow spectrum obtained is presented and tentative identification of most of the emission features is made.

  7. Spectral catalogue of the intermediate ionization states of iron in the extreme ultraviolet

    SciTech Connect

    Beiersdorfer, P.; Utter, S.B.; Brown, G.V.

    1998-05-13

    Using precisely controlled laboratory conditions we have begun to establish a spectral catalogue of the intermediate ionization states of iron, Fe IX - Fe XXIV, in the extreme ultraviolet. The measurements are being performed in support of the development of reliable modeling codes for the analysis of data from the Extreme Ultraviolet Explorer and future space astrophysics missions sensitive to extreme ultraviolet radiation. They aim to resolve the controversies surrounding the short-wavelength spectra of stellar coronae. Preliminary measurements showing the wealth of iron lines in the 50-120 {Angstrom} region are presented.

  8. Extreme Ultraviolet Emission Lines of Iron Fe XI-XIII

    NASA Astrophysics Data System (ADS)

    Lepson, Jaan; Beiersdorfer, P.; Brown, G. V.; Liedahl, D. A.; Brickhouse, N. S.; Dupree, A. K.

    2013-04-01

    The extreme ultraviolet (EUV) spectral region (ca. 20--300 Å) is rich in emission lines from low- to mid-Z ions, particularly from the middle charge states of iron. Many of these emission lines are important diagnostics for astrophysical plasmas, providing information on properties such as elemental abundance, temperature, density, and even magnetic field strength. In recent years, strides have been made to understand the complexity of the atomic levels of the ions that emit the lines that contribute to the richness of the EUV region. Laboratory measurements have been made to verify and benchmark the lines. Here, we present laboratory measurements of Fe XI, Fe XII, and Fe XIII between 40-140 Å. The measurements were made at the Lawrence Livermore electron beam ion trap (EBIT) facility, which has been optimized for laboratory astrophysics, and which allows us to select specific charge states of iron to help line identification. We also present new calculations by the Hebrew University - Lawrence Livermore Atomic Code (HULLAC), which we also utilized for line identification. We found that HULLAC does a creditable job of reproducing the forest of lines we observed in the EBIT spectra, although line positions are in need of adjustment, and line intensities often differed from those observed. We identify or confirm a number of new lines for these charge states. This work was supported by the NASA Solar and Heliospheric Program under Contract NNH10AN31I and the DOE General Plasma Science program. Work was performed in part under the auspices of the Department of Energy by Lawrence Livermore National Laboratory under Contract DEAC52-07NA27344.

  9. Solar extreme ultraviolet sensor and advanced langmuir probe

    NASA Technical Reports Server (NTRS)

    Voronka, N. R.; Block, B. P.; Carignan, G. R.

    1992-01-01

    For more than two decades, the staff of the Space Physics Research Laboratory (SPRL) has collaborated with the Goddard Space Flight Center (GSFC) in the design and implementation of Langmuir probes (LP). This program of probe development under the direction of Larry Brace of GSFC has evolved methodically with innovations to: improve measurement precision, increase the speed of measurement, and reduce the weight, size, power consumption and data rate of the instrument. Under contract NAG5-419 these improvements were implemented and are what characterize the Advanced Langmuir Probe (ALP). Using data from the Langmuir Probe on the Pioneer Venus Orbiter, Brace and Walter Hoegy of GSFC demonstrated a novel method of monitoring the solar extreme ultraviolet (EUV) flux. This led to the idea of developing a sensor similar to a Langmuir probe specifically designed to measure solar EUV (SEUV) that uses a similar electronics package. Under this contract, a combined instrument package of the ALP and SEUV sensor was to be designed, constructed, and laboratory tested. Finally the instrument was to be flight tested as part of sounding rocket experiment to acquire the necessary data to validate this method for possible use in future earth and planetary aeronomy missions. The primary purpose of this contract was to develop the electronics hardware and software for this instrument, since the actual sensors were suppied by GSFC. Due to budget constraints, only a flight model was constructed. These electronics were tested and calibrated in the laboratory, and then the instrument was integrated into the rocket payload at Wallops Flight Facility where it underwent environmental testing. After instrument recalibration at SPRL, the payload was reintegrated and launched from the Poker Flat Research Range near Fairbanks Alaska. The payload was successfully recovered and after refurbishment underwent further testing and developing to improve its performance for future use.

  10. Reconstruction of Solar Extreme Ultraviolet Flux 1740 - 2015

    NASA Astrophysics Data System (ADS)

    Svalgaard, Leif

    2016-08-01

    Solar extreme ultraviolet (EUV) radiation creates the conducting E-layer of the ionosphere, mainly by photo-ionization of molecular oxygen. Solar heating of the ionosphere creates thermal winds, which by dynamo action induce an electric field driving an electric current having a magnetic effect observable on the ground, as was discovered by G. Graham in 1722. The current rises and falls with the Sun, and thus causes a readily observable diurnal variation of the geomagnetic field, allowing us to deduce the conductivity and thus the EUV flux as far back as reliable magnetic data reach. High-quality data go back to the "Magnetic Crusade" of the 1830s and less reliable, but still usable, data are available for portions of the 100 years before that. J.R. Wolf and, independently, J.-A. Gautier discovered the dependence of the diurnal variation on solar activity, and today we understand and can invert that relationship to construct a reliable record of the EUV flux from the geomagnetic record. We compare that to the F_{10.7} flux and the sunspot number, and we find that the reconstructed EUV flux reproduces the F_{10.7} flux with great accuracy. On the other hand, it appears that the Relative Sunspot Number as currently defined is beginning to no longer be a faithful representation of solar magnetic activity, at least as measured by the EUV and related indices. The reconstruction suggests that the EUV flux reaches the same low (but non-zero) value at every sunspot minimum (possibly including Grand Minima), representing an invariant "solar magnetic ground state".

  11. Analysis of extreme ultraviolet spectra from laser produced rhenium plasmas

    NASA Astrophysics Data System (ADS)

    Wu, Tao; Higashiguchi, Takeshi; Li, Bowen; Suzuki, Yuhei; Arai, Goki; Dinh, Thanh-Hung; Dunne, Padraig; O'Reilly, Fergal; Sokell, Emma; Liu, Luning; O'Sullivan, Gerry

    2015-08-01

    Extreme ultraviolet spectra of highly-charged rhenium ions were observed in the 1-7 nm region using two Nd:YAG lasers with pulse lengths of 150 ps and 10 ns, respectively, operating at a number of laser power densities. The maximum focused peak power density was 2.6 × 1014 W cm-2 for the former and 5.5 × 1012 W cm-2 for the latter. The Cowan suite of atomic structure codes and unresolved transition array (UTA) approach were used to calculate and interpret the emission properties of the different spectra obtained. The results show that n = 4-n = 4 and n = 4-n = 5 UTAs lead to two intense quasi-continuous emission bands in the 4.3-6.3 nm and 1.5-4.3 nm spectral regions. As a result of the different ion stage distributions in the plasmas induced by ps and ns laser irradiation the 1.5-4.3 nm UTA peak moves to shorter wavelength in the ps laser produced plasma spectra. For the ns spectrum, the most populated ion stage during the lifetime of this plasma that could be identified from the n = 4-n = 5 transitions was Re23+ while for the ps plasma the presence of significantly higher stages was demonstrated. For the n = 4-n = 4 4p64dN-4p54dN+1 + 4p64dN-14f transitions, the 4d-4f transitions contribute mainly in the most intense 4.7-5.5 nm region while the 4p-4d subgroup gives rise to a weaker feature in the 4.3-4.7 nm region. A number of previously unidentified spectral features produced by n = 4-n = 5 transitions in the spectra of Re XVI to Re XXXIX are identified.

  12. NEW SOLAR EXTREME-ULTRAVIOLET IRRADIANCE OBSERVATIONS DURING FLARES

    SciTech Connect

    Woods, Thomas N.; Hock, Rachel; Eparvier, Frank; Jones, Andrew R.; Chamberlin, Phillip C.; Klimchuk, James A.; Didkovsky, Leonid; Judge, Darrell; Mariska, John; Warren, Harry; Schrijver, Carolus J.; Webb, David F.; Bailey, Scott; Tobiska, W. Kent

    2011-10-01

    New solar extreme-ultraviolet (EUV) irradiance observations from the NASA Solar Dynamics Observatory (SDO) EUV Variability Experiment provide full coverage in the EUV range from 0.1 to 106 nm and continuously at a cadence of 10 s for spectra at 0.1 nm resolution and even faster, 0.25 s, for six EUV bands. These observations can be decomposed into four distinct characteristics during flares. First, the emissions that dominate during the flare's impulsive phase are the transition region emissions, such as the He II 30.4 nm. Second, the hot coronal emissions above 5 MK dominate during the gradual phase and are highly correlated with the GOES X-ray. A third flare characteristic in the EUV is coronal dimming, seen best in the cool corona, such as the Fe IX 17.1 nm. As the post-flare loops reconnect and cool, many of the EUV coronal emissions peak a few minutes after the GOES X-ray peak. One interesting variation of the post-eruptive loop reconnection is that warm coronal emissions (e.g., Fe XVI 33.5 nm) sometimes exhibit a second large peak separated from the primary flare event by many minutes to hours, with EUV emission originating not from the original flare site and its immediate vicinity, but rather from a volume of higher loops. We refer to this second peak as the EUV late phase. The characterization of many flares during the SDO mission is provided, including quantification of the spectral irradiance from the EUV late phase that cannot be inferred from GOES X-ray diagnostics.

  13. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.

    PubMed

    Bogachev, S A; Chkhalo, N I; Kuzin, S V; Pariev, D E; Polkovnikov, V N; Salashchenko, N N; Shestov, S V; Zuev, S Y

    2016-03-20

    We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3  nm, λ=17-21  nm, λ=28-33  nm, and λ=58.4  nm. We found new material pairs, which will make new spaceborne experiments possible due to the high reflection efficiencies, spectral resolution, and long-term stabilities of the proposed multilayer coatings. In the spectral range λ=13  nm, Mo/Be multilayer mirrors were shown to demonstrate a better ratio of reflection efficiency and spectral resolution compared with the commonly used Mo/Si. In the spectral range λ=17-21  nm, a new multilayer structure Al/Si was proposed, which had higher spectral resolution along with comparable reflection efficiency compared with the commonly used Al/Zr multilayer structures. In the spectral range λ=30  nm, the Si/B4C/Mg/Cr multilayer structure turned out to best obey reflection efficiency and long-term stability. The B4C and Cr layers prevented mutual diffusion of the Si and Mg layers. For the spectral range λ=58  nm, a new multilayer Mo/Mg-based structure was developed; its reflection efficiency and long-term stability have been analyzed. We also investigated intrinsic stresses inherent for most of the multilayer structures and proposed possibilities for stress elimination. PMID:27140543

  14. Sources for beyond extreme ultraviolet lithography and water window imaging

    NASA Astrophysics Data System (ADS)

    O'Sullivan, Gerry; Li, Bowen; Dunne, Padraig; Hayden, Paddy; Kilbane, Deirdre; Lokasani, Ragava; Long, Elaine; Ohashi, Hayato; O'Reilly, Fergal; Sheil, John; Sheridan, Paul; Sokell, Emma; Suzuki, Chihiro; White, Elgiva; Higashiguchi, Takeshi

    2015-05-01

    Lithography tools are being built and shipped to semiconductor manufacturers for high volume manufacturing using extreme ultraviolet lithography (EUVL) at a wavelength of 13.5 nm. This wavelength is based on the availability of Mo/Si multilayer mirrors (MLMs) with a reflectivity of ˜70% at this wavelength. Moreover, the primary lithography tool manufacturer, ASML, has identified 6.x nm, where x˜7, as the wavelength of choice for so-called Beyond EUVL, based on the availability of La/B4C MLMs, with theoretical reflectance approaching 80% at this wavelength. The optimum sources have been identified as laser produced plasmas of Gd and Tb, as n = 4-n = 4 transitions in their ions emit strongly near this wavelength. However, to date, the highest conversion efficiency obtained, for laser to EUV energy emitted within the 0.6% wavelength bandwidth of the mirror is only 0.8%, pointing to the need to identify other potential sources or consider the selection of other wavelengths. At the same time, sources for other applications are being developed. Conventional sources for soft x-ray microscopy use H-like line emission from liquid nitrogen or carbon containing liquid jets which can be focused using zone plates. Recently the possibility of using MLMs with n = 4-n = 4 emission from a highly charged Bi plasma was proposed and subsequently the possibility of using Δn = 1 transitions in 3rd row transition elements was identified. All of these studies seek to identify spectral features that coincide with the reflectance characteristics of available MLMs, determine the conditions under which they are optimized and establish the maximum conversion efficiencies obtainable. Thus, there is a need for systematic studies of laser produced plasmas of a wide range of elements as some of the challenges are similar for all of these sources and some recent results will be presented.

  15. Lamp for generating high power ultraviolet radiation

    DOEpatents

    Morgan, Gary L.; Potter, James M.

    2001-01-01

    The apparatus is a gas filled ultraviolet generating lamp for use as a liquid purifier. The lamp is powred by high voltage AC, but has no metallic electrodes within or in contact with the gas enclosure which is constructed as two concentric quartz cylinders sealed together at their ends with the gas fill between the cylinders. Cooling liquid is pumped through the volume inside the inner quartz cylinder where an electrically conductive pipe spaced from the inner cylinder is used to supply the cooling liquid and act as the high voltage electrode. The gas enclosure is enclosed within but spaced from a metal housing which is connected to operate as the ground electrode of the circuit and through which the treated fluid flows. Thus, the electrical circuit is from the central pipe, and through the cooling liquid, the gas enclosure, the treated liquid on the outside of the outer quartz cylinder, and to the housing. The high voltage electrode is electrically isolated from the source of cooling liquid by a length of insulated hose which also supplies the cooling liquid.

  16. Angular distribution of ions and extreme ultraviolet emission in laser-produced tin droplet plasma

    NASA Astrophysics Data System (ADS)

    Chen, Hong; Wang, Xinbing; Duan, Lian; Lan, Hui; Chen, Ziqi; Zuo, Duluo; Lu, Peixiang

    2015-05-01

    Angular-resolved ion time-of-flight spectra as well as extreme ultraviolet radiation in laser-produced tin droplet plasma are investigated experimentally and theoretically. Tin droplets with a diameter of 150 μm are irradiated by a pulsed Nd:YAG laser. The ion time-of-flight spectra measured from the plasma formed by laser irradiation of the tin droplets are interpreted in terms of a theoretical elliptical Druyvesteyn distribution to deduce ion density distributions including kinetic temperatures of the plasma. The opacity of the plasma for extreme ultraviolet radiation is calculated based on the deduced ion densities and temperatures, and the angular distribution of extreme ultraviolet radiation is expressed as a function of the opacity using the Beer-Lambert law. Our results show that the calculated angular distribution of extreme ultraviolet radiation is in satisfactory agreement with the experimental data.

  17. Angular distribution of ions and extreme ultraviolet emission in laser-produced tin droplet plasma

    SciTech Connect

    Chen, Hong; Duan, Lian; Lan, Hui; Wang, Xinbing Chen, Ziqi; Zuo, Duluo; Lu, Peixiang

    2015-05-21

    Angular-resolved ion time-of-flight spectra as well as extreme ultraviolet radiation in laser-produced tin droplet plasma are investigated experimentally and theoretically. Tin droplets with a diameter of 150 μm are irradiated by a pulsed Nd:YAG laser. The ion time-of-flight spectra measured from the plasma formed by laser irradiation of the tin droplets are interpreted in terms of a theoretical elliptical Druyvesteyn distribution to deduce ion density distributions including kinetic temperatures of the plasma. The opacity of the plasma for extreme ultraviolet radiation is calculated based on the deduced ion densities and temperatures, and the angular distribution of extreme ultraviolet radiation is expressed as a function of the opacity using the Beer–Lambert law. Our results show that the calculated angular distribution of extreme ultraviolet radiation is in satisfactory agreement with the experimental data.

  18. Electron roles in extreme ultraviolet lithography mirror contamination and flashover

    NASA Astrophysics Data System (ADS)

    Catalfano, Mark

    The purpose of this study was to characterize and study the contamination behavior of residual hydrocarbons and water vapor in a vacuum environment similar to that suited to the performance of EUV Lithography devices. A 50nm ruthenium film deposited on a silicon surface which served to simulate the Ru coated mirrors in a typical lithography setup was bombarded with 13.5 nm wavelength light at a grazing angle. We then studied in real-time the contamination effect by using extreme ultraviolet photoelectron spectroscopy (EUPS). This allowed us to examine the behavior of the contaminants as they formed dipoles. By monitoring X-Ray Photoelectron Spectroscopy (XPS) as a function of angle, we determined that carbon species may be more prevalent in the normal directions, while water and related species tend to be at grazing angles. While characterizing the contamination is certainly important for finding ways of mitigating it, we also attempted to prove that the electrons from a typical EUV source are just as important in terms of causing contamination if not more so than the light itself. By monitoring the contamination with both AES and XPS together, we were able to prove that in the absence of electrons the carbon buildup was far reduced. Similar results were found while studying the grazing angle reflectivity of the ruthenium sample. Electrons also proved to be important in surface flashover, a phenomenon in which the polarity on the surface can suddenly switch from negative to positive over a course of seconds. We saw this effect on gold and examined it in real-time with the help of secondary electron spectroscopy (SES). The flashover effect seemed to be defect driven. Interestingly, there was a dependence on energy change: when changing electrons from a lower to higher energy a flashover was observed, but not while changing from a high to a low energy. While we observed this on gold, silicon, and carbon it could certainly be extended to occurring on the photoresist

  19. Ultrafast Extreme Ultraviolet Spectroscopy of Lead Iodide and Methylammonium Lead Iodide

    NASA Astrophysics Data System (ADS)

    Verkamp, Max; Lin, Ming-Fu; Ryland, Elizabeth; Vura-Weis, Josh

    Methylammonium lead iodide (perovskite) is a leading candidate for use in next-generation solar cell devices. However, the photophysics of perovskite responsible for its strong photovoltaic qualities are not fully understood. Ultrafast extreme ultraviolet (XUV) spectroscopy was used to investigate relaxation dynamics in perovskite and its precursor, lead iodide, with carrier-specific signals arising from transitions from a common inner-shell level (I 4d) to the valence and conduction bands. Ultrashort (30 fs) pulses of XUV radiation in a broad spectrum (40-70 eV) were obtained using high-harmonic generation in a tabletop instrument. Transient absorption measurements with visible pump (3.1 eV) and XUV probe directly observed the relaxation of charge carriers after above band excitation for both perovskite and lead iodide in the femtosecond and picosecond time ranges.

  20. Evaluation of alcoholic hydroxyl derivatives for chemically amplified extreme ultraviolet resist

    NASA Astrophysics Data System (ADS)

    Furukawa, Kikuo; Kozawa, Takahiro; Tagawa, Seiichi

    2009-03-01

    Extreme ultraviolet (EUV) lithography is the most favorable process as next-generation lithography. For the development of EUV resists, phenolic materials such as poly (4-hydroxystyrene) have been investigated. Phenolic hydroxyl groups of polymers play an important role in acid diffusion, dissolution kinetics, and adhesion to substrates. Besides these important roles, phenolic hydroxyl groups are also an effective proton source in acid generation in EUV resists. However, the roles of alcohol hydroxyl groups have not been well-studied. To clarify the difference between phenolic and alcoholic hydroxyl groups upon exposure to EUV radiation, we synthesized acrylic terpolymers containing alcoholic hydroxyl groups as model photopolymers and exposed the resist samples based on these polymers to EUV radiation. On the basis of the lithographic performances of these resist samples, we evaluated the characteristics of alcoholic hydroxyl groups upon exposure to EUV radiation. We discuss the relationship between the chemical structures of these derivatives and lithographic performance.

  1. Spectroscopy of the Far and Extreme Ultraviolet Dayglow.

    NASA Astrophysics Data System (ADS)

    Bowers, Charles W.

    We have designed, built and flown in a sounding rocket payload a spectrograph with (DBLTURN) 2 (ANGSTROM) resolution from 850 (ANGSTROM) to 1850 (ANGSTROM) obtaining the highest resolution, broad wavelength coverage UV dayglow spectrum to date. This instrument utilizes a newly developed photon counting detector consisting of an ultraviolet-to -visible-light image intensifier with two microchannel plates in a tandem arrangement followed by a phosphor coated on the face of a fiber optics output bundle. Light generated in the phosphor by electron pulses produced by the MCP stack is transmitted to a Reticon (1024S) photodiode array with 1024 independent photodiodes. The broad light pulses generated by the intensifier were detected by the photodiode array. This flight data was transmitted to the ground and centroided, recovering the spectrograph resolution of (DBLTURN) 2 (ANGSTROM). The vacuum spectrograph contains an osmium coated, holographic f/2 concave diffraction grating, baffled to f/4 for flight. A movable slit wheel mechanism provides a vacuum seal, which is broken during flight as the entrance slit is moved into position. The UV dayglow spectrum obtained is presented and tentative identification of most of the emission features is made. A relatively bright emission line at 1173 (ANGSTROM) is identified as arising from the OI 3s' ('3)D('0) - 2p('4) ('1)D transition and is well resolved from adjacent NI emission features. Enhanced emission from this line is expected by the radiative entrapment of photons from the strong, optically thick 989 (ANGSTROM) emission feature. The simultaneous observations of the 989 (ANGSTROM) and 1173 (ANGSTROM) emissions allows comparison with model predictions of the variation with altitude of these related features (Meier, 1982). This comparison is consistent with the radiative entrapment model showing a decrease in 989 (ANGSTROM) emission and an increase in 1173 (ANGSTROM) emission at lower altitudes. The data are also consistent

  2. Extreme Ultraviolet Variability Experiment (EVE) Multiple EUV Grating Spectrographs (MEGS): Radiometric Calibrations and Results

    NASA Technical Reports Server (NTRS)

    Hock, R. A.; Woods, T. N.; Crotser, D.; Eparvier, F. G.; Woodraska, D. L.; Chamberlin, P. C.; Woods, E. C.

    2010-01-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in early 2010, incorporates a suite of instruments including the Extreme Ultraviolet Variability Experiment (EVE). EVE has multiple instruments including the Multiple Extreme ultraviolet Grating Spectrographs (MEGS) A, B, and P instruments, the Solar Aspect Monitor (SAM), and the Extreme ultraviolet SpectroPhotometer (ESP). The radiometric calibration of EVE, necessary to convert the instrument counts to physical units, was performed at the National Institute of Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF III) located in Gaithersburg, Maryland. This paper presents the results and derived accuracy of this radiometric calibration for the MEGS A, B, P, and SAM instruments, while the calibration of the ESP instrument is addressed by Didkovsky et al. . In addition, solar measurements that were taken on 14 April 2008, during the NASA 36.240 sounding-rocket flight, are shown for the prototype EVE instruments.

  3. FAST TRACK COMMUNICATION: Inhomogeneous charge redistribution in Xe clusters exposed to an intense extreme ultraviolet free electron laser

    NASA Astrophysics Data System (ADS)

    Iwayama, H.; Sugishima, A.; Nagaya, K.; Yao, M.; Fukuzawa, H.; Motomura, K.; Liu, X.-J.; Yamada, A.; Wang, C.; Ueda, K.; Saito, N.; Nagasono, M.; Tono, K.; Yabashi, M.; Ishikawa, T.; Ohashi, H.; Kimura, H.; Togashi, T.

    2010-08-01

    The emission of highly charged ions from Xe clusters exposed to intense extreme ultraviolet laser pulses (λ ~ 52 nm) from the free electron laser in Japan was investigated using ion momentum spectroscopy. With increasing average cluster size, we observed multiply charged ions Xez + up to z = 3. From kinetic energy distributions, we found that multiply charged ions were generated near the cluster surface. Our results suggest that charges are inhomogeneously redistributed in the cluster to lower the total energy stored in the clusters.

  4. Free-electron laser sources of extreme-ultraviolet radiation and their vacuum requirements

    SciTech Connect

    Newnam, B.E.

    1990-01-01

    Recent development of free-electron laser (FEL) component technologies should enable these devices to operate in the extreme-ultraviolet, well below 100 nm. When fully developed, FELs represent the next generation of coherent-radiation sources with peak- and average-power outputs surpassing those of any existing, continuously tunable photon source by many orders of magnitude. An rf-linac-based, multiple-FEL facility, spanning the spectral range from 1 nm to 100 {mu}m, is proposed. To enable such a facility to operate without significant degradation over long periods, contamination of certain of the FEL components must be prevented. Requirements for ultra-high vacuum and restricted contamination from outgassing from chamber walls are discussed. 73 refs., 11 figs., 4 tabs.

  5. Shot noise limit of sensitivity of chemically amplified resists used for extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Fujii, Shinya; Kozawa, Takahiro; Okamoto, Kazumasa; Santillan, Julius Joseph; Itani, Toshiro

    2015-11-01

    With the improvement of resolution, the shot noise effect becomes a serious concern in the lithography used for high-volume production of semiconductor devices. In this study, the shot noise limit of the sensitivity of chemically amplified resists was investigated from the viewpoint of sensitivity enhancement, assuming extreme ultraviolet lithography. The latent images of line-and-space patterns with 11 nm half-pitch were calculated using a Monte Carlo method. The effect of secondary electron blur was eliminated to clarify the shot noise limit of line edge roughness (LER). When the requirement for line width roughness (LWR) was assumed to be 10% critical dimension (CD), the shot noise limit of sensitivity was >100 mJ cm-2. For the 20% CD LWR, the shot noise limits of sensitivity for the 10, 20, and 30 wt % acid generator concentrations were 20, 9, and 7 mJ cm-2, respectively.

  6. Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2014-03-01

    The resolution of extreme ultraviolet (EUV) lithography with chemically amplified resist processes has reached 16 nm (half-pitch). The development of chemically amplified resists is ongoing toward the 11 nm node. However, the stochastic effects are increasingly becoming a significant concern with the continuing shrinkage of features. In this study, the fluctuation of protected unit distribution caused by the stochastic effects during image formation was investigated assuming line-and-space patterns with 11 nm half-pitch. Contrary to expectations, the standard deviation of the number of protected units connected to a polymer after postexposure baking (PEB) did not differ from that for 16 nm half-pitch. The standard deviation after PEB increased with the effective reaction radius for deprotection and the initial standard deviation before PEB. Because of the severe requirements for resist processes, the stochastic effects in chemical reactions should be taken into account in the design of next-generation resists.

  7. Relativistic electron mirrors from nanoscale foils for coherent frequency upshift to the extreme ultraviolet

    PubMed Central

    Kiefer, D.; Yeung, M.; Dzelzainis, T.; Foster, P.S.; Rykovanov, S.G.; Lewis, C.LS.; Marjoribanks, R.S.; Ruhl, H.; Habs, D.; Schreiber, J.; Zepf, M.; Dromey, B.

    2013-01-01

    Reflecting light from a mirror moving close to the speed of light has been envisioned as a route towards producing bright X-ray pulses since Einstein’s seminal work on special relativity. For an ideal relativistic mirror, the peak power of the reflected radiation can substantially exceed that of the incident radiation due to the increase in photon energy and accompanying temporal compression. Here we demonstrate for the first time that dense relativistic electron mirrors can be created from the interaction of a high-intensity laser pulse with a freestanding, nanometre-scale thin foil. The mirror structures are shown to shift the frequency of a counter-propagating laser pulse coherently from the infrared to the extreme ultraviolet with an efficiency >104 times higher than in the case of incoherent scattering. Our results elucidate the reflection process of laser-generated electron mirrors and give clear guidance for future developments of a relativistic mirror structure. PMID:23612304

  8. Optimization of fullerene-based negative tone chemically amplified fullerene resist for extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Frommhold, A.; Yang, D. X.; McClelland, A.; Xue, X.; Ekinci, Y.; Palmer, R. E.; Robinson, A. P. G.

    2014-03-01

    While the technological progress of Next Generation Lithography (NGL) steadily continues, further progress is required before successful insertion in high volume manufacturing is possible. A key issue is the development of new resists suitable to achieve higher lithographic resolution with acceptable sensitivity and line edge roughness. Molecular resists have been a primary focus of interest for NGL because they promise high resolution and small line edge roughness (LER), but no suitable resist candidate has emerged yet that fulfills all of the industry's criteria. We have previously shown first extreme ultraviolet lithography (EUVL) exposures for a new fullerene derivative based three-component negative tone chemically amplified resist with suitable properties close to or within the target range of the resist metrics as set out in the International Technology Roadmap for Semiconductors for 2016. Here we present the results of our efforts to optimize the EUVL performance of our resist system especially with regards to LER.

  9. Modeling and measuring the transport and scattering of energetic debris in an extreme ultraviolet plasma source

    NASA Astrophysics Data System (ADS)

    Sporre, John R.; Elg, Daniel T.; Kalathiparambil, Kishor K.; Ruzic, David N.

    2016-01-01

    A theoretical model for describing the propagation and scattering of energetic species in an extreme ultraviolet (EUV) light lithography source is presented. An EUV light emitting XTREME XTS 13-35 Z-pinch plasma source is modeled with a focus on the effect of chamber pressure and buffer gas mass on energetic ion and neutral debris transport. The interactions of the energetic debris species, which is generated by the EUV light emitting plasma, with the buffer gas and chamber walls are considered as scattering events in the model, and the trajectories of the individual atomic species involved are traced using a Monte Carlo algorithm. This study aims to establish the means by which debris is transported to the intermediate focus with the intent to verify the various mitigation techniques currently employed to increase EUV lithography efficiency. The modeling is compared with an experimental investigation.

  10. Methods and apparatus for use with extreme ultraviolet light having contamination protection

    DOEpatents

    Chilese, Francis C.; Torczynski, John R.; Garcia, Rudy; Klebanoff, Leonard E.; Delgado, Gildardo R.; Rader, Daniel J.; Geller, Anthony S.; Gallis, Michail A.

    2016-07-12

    An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

  11. Ionization Avalanching in Clusters Ignited by Extreme-Ultraviolet Driven Seed Electrons.

    PubMed

    Schütte, Bernd; Arbeiter, Mathias; Mermillod-Blondin, Alexandre; Vrakking, Marc J J; Rouzée, Arnaud; Fennel, Thomas

    2016-01-22

    We study the ionization dynamics of Ar clusters exposed to ultrashort near-infrared (NIR) laser pulses for intensities well below the threshold at which tunnel ionization ignites nanoplasma formation. We find that the emission of highly charged ions up to Ar^{8+} can be switched on with unit contrast by generating only a few seed electrons with an ultrashort extreme-ultraviolet (XUV) pulse prior to the NIR field. Molecular dynamics simulations can explain the experimental observations and predict a generic scenario where efficient heating via inverse bremsstrahlung and NIR avalanching is followed by resonant collective nanoplasma heating. The temporally and spatially well-controlled injection of the XUV seed electrons opens new routes for controlling avalanching and heating phenomena in nanostructures and solids, with implications for both fundamental and applied laser-matter science. PMID:26849590

  12. Relativistic electron mirrors from nanoscale foils for coherent frequency upshift to the extreme ultraviolet.

    PubMed

    Kiefer, D; Yeung, M; Dzelzainis, T; Foster, P S; Rykovanov, S G; Lewis, C Ls; Marjoribanks, R S; Ruhl, H; Habs, D; Schreiber, J; Zepf, M; Dromey, B

    2013-01-01

    Reflecting light from a mirror moving close to the speed of light has been envisioned as a route towards producing bright X-ray pulses since Einstein's seminal work on special relativity. For an ideal relativistic mirror, the peak power of the reflected radiation can substantially exceed that of the incident radiation due to the increase in photon energy and accompanying temporal compression. Here we demonstrate for the first time that dense relativistic electron mirrors can be created from the interaction of a high-intensity laser pulse with a freestanding, nanometre-scale thin foil. The mirror structures are shown to shift the frequency of a counter-propagating laser pulse coherently from the infrared to the extreme ultraviolet with an efficiency >10(4) times higher than in the case of incoherent scattering. Our results elucidate the reflection process of laser-generated electron mirrors and give clear guidance for future developments of a relativistic mirror structure. PMID:23612304

  13. Fluorescence of molecular hydrogen excited by solar extreme-ultraviolet radiation

    NASA Technical Reports Server (NTRS)

    Feldman, P. D.; Fastie, W. G.

    1973-01-01

    During trans-earth coast, the Apollo 17 ultraviolet spectrometer was scheduled to make observations of the far ultraviolet background in selected regions of the sky. In the course of one of these observations, the spacecraft fuel cells were routinely purged of excess hydrogen and water vapor. The ultraviolet fluorescence spectrum of the purged molecular hydrogen excited by solar extreme ultraviolet radiation is interpreted by absorption of solar L-beta and L-gamma radiation in the nearly resonant (6, 0) and (11, 0) Lyman bands. The results are deemed significant for ultraviolet spectroscopic investigations of the atmospheres of the moon and planets since Lyman-band fluorescence provides an unambiguous means of identification of molecular hydrogen in upper atmospheres.

  14. Effect of ultraviolet radiation on microorganisms as a principal extremal factor of space environment.

    PubMed

    Fedorova, R I

    1964-01-01

    1. The problem of the transport of viable germs through interplanetary space has recently acquired special interest arising from the necessity of sterilization of space ships. 2. Of all cosmic extremal factors ultraviolet solar radiation is the most dangerous for microorganisms. The intensity of the most bactericidal region of ultraviolet radiation at a distance of one astronomical unit from the sun is 2 x 10(3) erg per cm2. 3. Sensitivity of microorganisms to ultraviolet rays varies in a large range. For the most resistant forms the lethal dose is approximately 440000 erg per cm2. 4. The penetrating capacity of ultraviolet radiation is very low, and therefore, even insignificant amounts of organic or mineral substances may protect the bacterial cell. 5. Dust particles of terrestrial origin carrying on themselves bacterial spores exert upon the latter a protective effect against ultraviolet radiation. PMID:11881651

  15. Atmosphere and water loss from early Mars under extreme solar wind and extreme ultraviolet conditions.

    PubMed

    Terada, Naoki; Kulikov, Yuri N; Lammer, Helmut; Lichtenegger, Herbert I M; Tanaka, Takashi; Shinagawa, Hiroyuki; Zhang, Tielong

    2009-01-01

    The upper limits of the ion pickup and cold ion outflow loss rates from the early martian atmosphere shortly after the Sun arrived at the Zero-Age-Main-Sequence (ZAMS) were investigated. We applied a comprehensive 3-D multi-species magnetohydrodynamic (MHD) model to an early martian CO(2)-rich atmosphere, which was assumed to have been exposed to a solar XUV [X-ray and extreme ultraviolet (EUV)] flux that was 100 times higher than today and a solar wind that was about 300 times denser. We also assumed the late onset of a planetary magnetic dynamo, so that Mars had no strong intrinsic magnetic field at that early period. We found that, due to such extreme solar wind-atmosphere interaction, a strong magnetic field of about approximately 4000 nT was induced in the entire dayside ionosphere, which could efficiently protect the upper atmosphere from sputtering loss. A planetary obstacle ( approximately ionopause) was formed at an altitude of about 1000 km above the surface due to the drag force and the mass loading by newly created ions in the highly extended upper atmosphere. We obtained an O(+) loss rate by the ion pickup process, which takes place above the ionopause, of about 1.5 x 10(28) ions/s during the first < or =150 million years, which is about 10(4) times greater than today and corresponds to a water loss equivalent to a global martian ocean with a depth of approximately 8 m. Consequently, even if the magnetic protection due to the expected early martian magnetic dynamo is neglected, ion pickup and sputtering were most likely not the dominant loss processes for the planet's initial atmosphere and water inventory. However, it appears that the cold ion outflow into the martian tail, due to the transfer of momentum from the solar wind to the ionospheric plasma, could have removed a global ocean with a depth of 10-70 m during the first < or =150 million years after the Sun arrived at the ZAMS. PMID:19216683

  16. Extreme ultraviolet reflectivity studies of gold on glass and metal substrates

    NASA Technical Reports Server (NTRS)

    Jelinsky, Sharon R.; Malina, Roger F.; Jelinsky, Patrick

    1988-01-01

    The paper reports measurements of the extreme ultraviolet reflectivity of gold from 44 to 920 A at grazing incidence. Gold was deposited using vacuum evaporation and electroplating on substrates of glass and polished nickel, respectively. Measurements are also presented of the extreme ultraviolet reflectivity of electroless nickel in the same wavelength region, where one of the polished nickel substrates was used as a sample. Derived optical constants for evaporated and electroplated gold and electroless nickel are presented. Additional studies of the effects of various contaminants on the EUV reflectivity are also reported. The variations of the optical constants are discussed in terms of density variations, surface roughness and contamination effects. These results ae reported as part of studies for the Extreme Ultraviolet Explorer satellite program to determine acceptance criteria for the EUV optics, contamination budgets and calibration plans.

  17. Laser triggered Z-pinch broadband extreme ultraviolet source for metrology

    SciTech Connect

    Tobin, I.; Lunney, J. G.; Juschkin, L.; Sidelnikov, Y.; O'Reilly, F.; Sokell, E.; Sheridan, P.

    2013-05-20

    We compare the extreme ultraviolet emission characteristics of tin and galinstan (atomic %: Ga: 78.35, In: 14.93, Sn: 6.72) between 10 nm and 18 nm in a laser-triggered discharge between liquid metal-coated electrodes. Over this wavelength range, the energy conversion efficiency for galinstan is approximately half that of tin, but the spectrum is less strongly peaked in the 13-15 nm region. The extreme ultraviolet source dimensions were 110 {+-} 25 {mu}m diameter and 500 {+-} 125 {mu}m length. The flatter spectrum, and -19 Degree-Sign C melting point, makes this galinstan discharge a relatively simple high radiance extreme ultraviolet light source for metrology and scientific applications.

  18. Concept Study Report: Extreme-Ultraviolet Imaging Spectrometer Solar-B

    NASA Technical Reports Server (NTRS)

    Doschek, George, A.; Brown, Charles M.; Davila, Joseph M.; Dere, Kenneth P.; Korendyke, Clarence M.; Mariska, John T.; Seely, John F.

    1999-01-01

    We propose a next generation Extreme-ultraviolet Imaging Spectrometer (EIS) that for the first time combines high spectral, spatial, and temporal resolution in a single solar spectroscopic instrument. The instrument consists of a multilayer-coated off-axis telescope mirror and a multilayer-coated grating spectrometer. The telescope mirror forms solar images on the spectrometer entrance slit assembly. The spectrometer forms stigmatic spectra of the solar region located at the slit. This region is selected by the articulated telescope mirror. Monochromatic images are obtained either by rastering the solar region across a narrow entrance slit, or by using a very wide slit (called a slot) in place of the slit. Monochromatic images of the region centered on the slot are obtained in a single exposure. Half of each optic is coated to maximize reflectance at 195 Angstroms; the other half to maximize reflectance at 270 Angstroms. The two Extreme Ultraviolet (EUV) wavelength bands have been selected to maximize spectral and dynamical and plasma diagnostic capabilities. Spectral lines are observed that are formed over a temperature range from about 0.1 MK to about 20 MK. The main EIS instrument characteristics are: wavelength bands - 180 to 204 Angstroms; 250 to 290 Angstroms; spectral resolution - 0.0223 Angstroms/pixel (34.3km/s at 195 Angstroms and 23.6 km/s at 284 Angstroms); slit dimensions - 4 slits, two currently specified dimensions are 1" x 1024" and 50" x 1024" (the slot); largest spatial field of view in a single exposure - 50" x 1024"; highest time resolution for active region velocity studies - 4.4 s.

  19. Sun's image in the extreme ultraviolet radiation emitted from the corona

    NASA Technical Reports Server (NTRS)

    1973-01-01

    The Skylab space station's Extreme Ultraviolet monitor is a closed loop television system that permitted man for the first time to watch the Sun's image in the extreme ultraviolet radiation emitted from its million-degree outer atmosphere, the corona. This photograph shows a view of the TV scope made by Scientist-Astronaut Owen K. Garriott, Skylab 3 science pilot, on August 15, 1973. Dr. Garriott made this picture with a Land-Polaroid SX-70 camera - the first time that any Polaroid camera has been used in space.

  20. Wave-mixing with high-order harmonics in extreme ultraviolet region

    SciTech Connect

    Dao, Lap Van; Dinh, Khuong Ba; Le, Hoang Vu; Gaffney, Naylyn; Hannaford, Peter

    2015-01-12

    We report studies of the wave-mixing process in the extreme ultraviolet region with two near-infrared driving and controlling pulses with incommensurate frequencies (at 1400 nm and 800 nm). A non-collinear scheme for the two beams is used in order to spatially separate and to characterise the properties of the high-order wave-mixing field. We show that the extreme ultraviolet frequency mixing can be treated by perturbative, very high-order nonlinear optics; the modification of the wave-packet of the free electron needs to be considered in this process.

  1. CITIUS: An infrared-extreme ultraviolet light source for fundamental and applied ultrafast science

    SciTech Connect

    Grazioli, C.; Gauthier, D.; Ivanov, R.; De Ninno, G.; Callegari, C.; Spezzani, C.; Ciavardini, A.; Coreno, M.; Frassetto, F.; Miotti, P.; Poletto, L.; Golob, D.; Kivimäki, A.; Mahieu, B.; Bučar, B.; Merhar, M.; Polo, E.; Ressel, B.

    2014-02-15

    We present the main features of CITIUS, a new light source for ultrafast science, generating tunable, intense, femtosecond pulses in the spectral range from infrared to extreme ultraviolet (XUV). The XUV pulses (about 10{sup 5}-10{sup 8} photons/pulse in the range 14-80 eV) are produced by laser-induced high-order harmonic generation in gas. This radiation is monochromatized by a time-preserving monochromator, also allowing one to work with high-resolution bandwidth selection. The tunable IR-UV pulses (10{sup 12}-10{sup 15} photons/pulse in the range 0.4-5.6 eV) are generated by an optical parametric amplifier, which is driven by a fraction of the same laser pulse that generates high order harmonics. The IR-UV and XUV pulses follow different optical paths and are eventually recombined on the sample for pump-probe experiments. We also present the results of two pump-probe experiments: with the first one, we fully characterized the temporal duration of harmonic pulses in the time-preserving configuration; with the second one, we demonstrated the possibility of using CITIUS for selective investigation of the ultra-fast dynamics of different elements in a magnetic compound.

  2. Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas

    SciTech Connect

    Kubiak, G.D.; Tichenor, D.A.; Sweatt, W.C.; Chow, W.W.

    1995-06-01

    Laser Plasma Sources (LPSS) of extreme ultraviolet radiation are an attractive alternative to synchrotron radiation sources for extreme ultraviolet lithography (EUVL) due to their modularity, brightness, and modest size and cost. To fully exploit the extreme ultraviolet power emitted by such sources, it is necessary to capture the largest possible fraction of the source emission half-sphere while simultaneously optimizing the illumination stationarity and uniformity on the object mask. In this LDRD project, laser plasma source illumination systems for EUVL have been designed and then theoretically and experimentally characterized. Ellipsoidal condensers have been found to be simple yet extremely efficient condensers for small-field EUVL imaging systems. The effects of aberrations in such condensers on extreme ultraviolet (EUV) imaging have been studied with physical optics modeling. Lastly, the design of an efficient large-solid-angle condenser has been completed. It collects 50% of the available laser plasma source power at 14 nm and delivers it properly to the object mask in a wide-arc-field camera.

  3. Wavebreaking-associated transmitted emission of attosecond extreme-ultraviolet pulses from laser-driven overdense plasmas

    NASA Astrophysics Data System (ADS)

    Chen, Zi-Yu; Cherednychek, Mykyta; Pukhov, Alexander

    2016-06-01

    We present a new mechanism of attosecond extreme-ultraviolet (XUV) pulses generation from a relativistic laser-driven overdense plasma surfaces in the wavebreaking regime. Through particle-in-cell simulations and analysis, we demonstrate that the observed ultrashort XUV emission for the parameters we considered is predominantly due to a strong plasma-density oscillation subsequent to wavebreaking. The coupling of the strong density variation and the transverse fields in the front surface layer gives rise to the transmitted emission with frequencies mainly around the local plasma frequency. This mechanism provides new insights into the scenarios of XUV generation from solid surfaces and the dynamics of laser–plasma interactions.

  4. Synthesis and characterization of attosecond light vortices in the extreme ultraviolet.

    PubMed

    Géneaux, R; Camper, A; Auguste, T; Gobert, O; Caillat, J; Taïeb, R; Ruchon, T

    2016-01-01

    Infrared and visible light beams carrying orbital angular momentum (OAM) are currently thoroughly studied for their extremely broad applicative prospects, among which are quantum information, micromachining and diagnostic tools. Here we extend these prospects, presenting a comprehensive study for the synthesis and full characterization of optical vortices carrying OAM in the extreme ultraviolet (XUV) domain. We confirm the upconversion rules of a femtosecond infrared helically phased beam into its high-order harmonics, showing that each harmonic order carries the total number of OAM units absorbed in the process up to very high orders (57). This allows us to synthesize and characterize helically shaped XUV trains of attosecond pulses. To demonstrate a typical use of these new XUV light beams, we show our ability to generate and control, through photoionization, attosecond electron beams carrying OAM. These breakthroughs pave the route for the study of a series of fundamental phenomena and the development of new ultrafast diagnosis tools using either photonic or electronic vortices. PMID:27573787

  5. Laser-assisted vacuum arc extreme ultraviolet source: a comparison of picosecond and nanosecond laser triggering

    NASA Astrophysics Data System (ADS)

    Beyene, Girum A.; Tobin, Isaac; Juschkin, Larissa; Hayden, Patrick; O’Sullivan, Gerry; Sokell, Emma; Zakharov, Vassily S.; Zakharov, Sergey V.; O’Reilly, Fergal

    2016-06-01

    Extreme ultraviolet (EUV) light generation by hybrid laser-assisted vacuum arc discharge plasmas, utilizing Sn-coated rotating-disc-electrodes, was investigated. The discharge was initiated by localized ablation of the liquid tin coating of the cathode disc by a laser pulse. The laser pulse, at 1064 nm, was generated by Nd:YAG lasers with variable energy from 1 to 100 mJ per pulse. The impact of shortening the laser pulse from 7 ns to 170 ps on the EUV generation has been investigated in detail. The use of ps pulses resulted in an increase in emission of EUV radiation. With a fixed discharge energy of ~4 J, the EUV conversion efficiency tends to plateau at ~2.4  ±  0.25% for the ps laser pulses, while for the ns pulses, it saturates at ~1.7  ±  0.3%. Under similar discharge and laser energy conditions, operating the EUV source with the ps-triggering resulted also in narrower spectral profiles of the emission in comparison to ns-triggering. The results indicate an advantage in using ps-triggering in laser-assisted discharges to produce brighter plasmas required for applications such as metrology.

  6. Berkeley extreme-ultraviolet airglow rocket spectrometer: BEARS.

    PubMed

    Cotton, D M; Chakrabarti, S

    1992-09-20

    We describe the Berkeley extreme-UV airglow rocket spectrometer, which is a payload designed to test several thermospheric remote-sensing concepts by measuring the terrestrial O I far-UV and extreme-UV dayglow and the solar extreme-UV spectrum simultaneously. The instrument consisted of two near-normal Rowland mount spectrometers and a Lyman-alpha photometer. The dayglow spectrometer covered two spectral regions from 980 to 1040 A and from 1300 to 1360 A with 1.5-A resolution. The solar spectrometer had a bandpass of 250-1150 A with an ~ 10-A resolution. All three spectra were accumulated by using a icrochannel-plate-intensified, two-dimensional imaging detector with three separate wedge-and strip anode readouts. The hydrogen Lyman-alpha photometer was included to monitor the solar Lyman-alpha irradiance and geocoronal Lyman-alpha emissions. The instrument was designed, fabricated, and calibrated at the University of California, Berkeley and was successfully launched on 30 September 1988 aboard the first test flight of a four-stage sounding rocket, Black Brant XII. PMID:20733778

  7. IUE spectra of Feige 4, a suspected source of extreme-ultraviolet radiation

    NASA Astrophysics Data System (ADS)

    Holm, A. V.; Boggess, A.

    1982-06-01

    IUE spectra are presented for Feige 4, a DB-type white dwarf. The observed energy distribution is in good agreement with that predicted by a model atmosphere with an effective temperature of 15,500 K and having extremely low hydrogen and metal abundances. These results are evidence against Feige 4 being the source of the apparent extreme-ultraviolet signal detected by Prognoz 6.

  8. IUE spectra of Feige 4, a suspected source of extreme-ultraviolet radiation

    NASA Technical Reports Server (NTRS)

    Holm, A. V.; Boggess, A.

    1982-01-01

    IUE spectra are presented for Feige 4, a DB-type white dwarf. The observed energy distribution is in good agreement with that predicted by a model atmosphere with an effective temperature of 15,500 K and having extremely low hydrogen and metal abundances. These results are evidence against Feige 4 being the source of the apparent extreme-ultraviolet signal detected by Prognoz 6.

  9. SOLAR-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2001-01-01

    This Monthly Progress Report covers the reporting period through June 2001, Phase C/D, Detailed Design and Development Through Launch Plus Thirty Days, for selected components and subsystems of the Extreme ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  10. Solar-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2002-01-01

    This Monthly Progress Report covers the reporting period August 2002 of the Detailed Design and Development through Launch plus Thirty Days, Phase C/D, for selected components and subsystems of the Extreme ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  11. SOLAR-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2001-01-01

    This Monthly Progress Report covers the reporting period July 2001 of the Detailed Design and Development through Launch plus Thirty Days, Phase C/D, for selected components and subsystems of the Extreme Ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  12. Optical constants in the extreme ultraviolet and soft X-ray region

    NASA Technical Reports Server (NTRS)

    Rife, J. C.; Osantowski, J. F.

    1982-01-01

    The nature of optical constants and their measurement by reflection or absorption techniques in the extreme ultraviolet and soft X-ray spectral region from 30 to 3000 eV is discussed with emphasis on mirror design. Sources of optical constant data are mentioned and reflectance measurements for SiC and Kanigen between 40 and 200 eV are reported.

  13. Low-cost method for producing extreme ultraviolet lithography optics

    DOEpatents

    Folta, James A.; Montcalm, Claude; Taylor, John S.; Spiller, Eberhard A.

    2003-11-21

    Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

  14. Computation of reflected images from extreme ultraviolet masks

    NASA Astrophysics Data System (ADS)

    Bollepalli, Srinivas B.; Cerrina, Franco

    1999-06-01

    With EUV lithography emerging as a promising technology for semiconductor device fabrication with critical dimensions extreme ultra violet mask. In particular, we show the effects caused due to diffraction, non-uniformities in the multilayer stack due to substrate defects, and partial spatial coherence. Several simulation examples are presented.

  15. A study of extreme-ultraviolet emission from cataclysmic variables

    NASA Technical Reports Server (NTRS)

    Polidan, Ronald S.; Mauche, Christopher W.; Wade, Richard A.

    1990-01-01

    Voyager far- and extreme UV spectrophotometric observations of five cataclysmic variables (the dwarf novae SS Cyg and VW Hyi and the novalike variables V3885 Sgr, RW Sex, and IX Vel) are combined with neutral hydrogen column densities derived from the curve-of-growth analysis of interstellar absorption lines in high-resolution IUE spectra to place upper limits on the emitted flux in the 600-700 A EUV band. The Voyager observations of VW Hyi were obtained during both normal and superoutbursts. Detailed accretion disk model calculations show that most of the 600-700 A flux in these systems should originate in the inner accretion disk rather than in the boundary layer. For VW Hyi, the low neutral hydrogen column and excellent Voyager superoutburst data place the observed upper limit to the 600-700 A flux well below the expected EUV flux from the model calculations.

  16. Extreme-ultraviolet lensless Fourier-transform holography.

    PubMed

    Lee, S H; Naulleau, P; Goldberg, K A; Cho, C H; Jeong, S; Bokor, J

    2001-06-01

    We demonstrate 100-nm-resolution holographic aerial image monitoring based on lensless Fourier-transform holography at extreme-UV (EUV) wavelengths, using synchrotron-based illumination. This method can be used to monitor the coherent imaging performance of EUV lithographic optical systems. The system has been implemented in the EUV phase-shifting point-diffraction interferometer recently developed at Lawrence Berkeley National Laboratory. Here we introduce the idea of the holographic aerial image-recording technique and present imaging performance characterization results for a 10x Schwarzschild objective, a prototype EUV lithographic optic. The results are compared with simulations, and good agreement is obtained. Various object patterns, including phase-shift-enhanced patterns, have been studied. Finally, the application of the holographic aerial image-recording technique to EUV multilayer mask-blank defect characterization is discussed. PMID:18357280

  17. An Optics Free Spectrometer for the Extreme Ultraviolet

    NASA Technical Reports Server (NTRS)

    Judge, D. L.; Daybell, M. D.; Hoffman, J. R.; Gruntman, M. A.; Ogawa, H. S.; Samson, J. A. R.

    1994-01-01

    The optics-free spectrometer is a photon spectrometer. It provides the photon spectrum of a broadband source by converting photons of energy E into electrons of energy E', according to the Einstein relation, E' = E - Ei. E, is the ionization threshold of the gas target of interest (any of the rare gases are suitable) and E is the incoming photon energy. As is evident from the above equation, only a single order spectrum is produced throughout the energy range between the first and second ionization potentials of the rare gas used. Photons with energy above the second ionization potential produce two groups of electrons, but they are readily distinguished from each other. This feature makes this device extremely useful for determining the true spectrum of a continuum source or a many line source. The principle of operation and the laboratory results obtained with a representative configuration of the optics-free spectrometer are presented.

  18. Extreme Ultraviolet Variability Experiment (EVE) Multiple EUV Grating Spectrographs (MEGS): Radiometric Calibrations and Results

    NASA Astrophysics Data System (ADS)

    Hock, R. A.; Chamberlin, P. C.; Woods, T. N.; Crotser, D.; Eparvier, F. G.; Woodraska, D. L.; Woods, E. C.

    2012-01-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in early 2010, incorporates a suite of instruments including the Extreme Ultraviolet Variability Experiment (EVE). EVE has multiple instruments including the Multiple Extreme ultraviolet Grating Spectrographs (MEGS) A, B, and P instruments, the Solar Aspect Monitor (SAM), and the Extreme ultraviolet SpectroPhotometer (ESP). The radiometric calibration of EVE, necessary to convert the instrument counts to physical units, was performed at the National Institute of Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF III) located in Gaithersburg, Maryland. This paper presents the results and derived accuracy of this radiometric calibration for the MEGS A, B, P, and SAM instruments, while the calibration of the ESP instrument is addressed by Didkovsky et al. ( Solar Phys., 2010, doi:10.1007/s11207-009-9485-8). In addition, solar measurements that were taken on 14 April 2008, during the NASA 36.240 sounding-rocket flight, are shown for the prototype EVE instruments.

  19. Fabrication of an extreme ultraviolet glancing incidence telescope

    NASA Technical Reports Server (NTRS)

    Fleetwood, C. M.; Mangus, J. D.

    1974-01-01

    A technique is described for use in the fabrication of glancing incidence telescopes which operate at large grazing angles (i.e., 8 to 15 degrees). Precision conic section plunge laps are used in a controlled grinding procedure to initially generate imaging surfaces which have a minimum of subsurface damage. A numerically controlled Moore Number 3 Measuring Machine is used throughout the fabrication procedure. Surface geometry accuracies on the order of one-tenth micron have been achieved.

  20. EUV SpectroPhotometer (ESP) in Extreme Ultraviolet Variability Experiment (EVE): Algorithms and Calibrations

    NASA Astrophysics Data System (ADS)

    Didkovsky, L.; Judge, D.; Wieman, S.; Woods, T.; Jones, A.

    2012-01-01

    The Extreme ultraviolet SpectroPhotometer (ESP) is one of five channels of the Extreme ultraviolet Variability Experiment (EVE) onboard the NASA Solar Dynamics Observatory (SDO). The ESP channel design is based on a highly stable diffraction transmission grating and is an advanced version of the Solar Extreme ultraviolet Monitor (SEM), which has been successfully observing solar irradiance onboard the Solar and Heliospheric Observatory (SOHO) since December 1995. ESP is designed to measure solar Extreme UltraViolet (EUV) irradiance in four first-order bands of the diffraction grating centered around 19 nm, 25 nm, 30 nm, and 36 nm, and in a soft X-ray band from 0.1 to 7.0 nm in the zeroth-order of the grating. Each band’s detector system converts the photo-current into a count rate (frequency). The count rates are integrated over 0.25-second increments and transmitted to the EVE Science and Operations Center for data processing. An algorithm for converting the measured count rates into solar irradiance and the ESP calibration parameters are described. The ESP pre-flight calibration was performed at the Synchrotron Ultraviolet Radiation Facility of the National Institute of Standards and Technology. Calibration parameters were used to calculate absolute solar irradiance from the sounding-rocket flight measurements on 14 April 2008. These irradiances for the ESP bands closely match the irradiance determined for two other EUV channels flown simultaneously: EVE’s Multiple EUV Grating Spectrograph (MEGS) and SOHO’s Charge, Element and Isotope Analysis System/ Solar EUV Monitor (CELIAS/SEM).

  1. Changes of solar extreme ultraviolet spectrum in solar cycle 24

    NASA Astrophysics Data System (ADS)

    Hao, Yongqiang; Zhang, Donghe; Xiao, Zuo; Huang, Jianping

    2016-07-01

    Following the extreme solar minimum during 2008 - 2009, solar activity keeps low in solar cycle 24 (SC24) and is making SC24 the weakest one of recent cycles. In this paper, we compare the solar EUV spectral irradiance between SC23 and SC24, using the measurements by the Solar EUV Experiment (SEE) on the Thermospheric Ionospheric Mesospheric Energy and Dynamics (TIMED) spacecraft. The EUV spectrum varies with solar activity, and is in general a linear function of a proxy index P= (F10.7 + F10.7A)/2. However, we find the slope of this function, i.e., the change rate of irradiance at each wavelength with P, differs between SC23 and SC24. Consequently, at a given P level, the irradiance in SC24 is higher at wavelength of 30 - 50 nm, but lower at 60 - 120 nm and longward of 140 nm; the inter-cycle variation of EUV irradiance at some wavelengths can be 30 - 40% in absolute flux. We further examine 38 most intense emission lines and find that, taking P as a reference, most of the bright coronal lines get stronger in SC24 and, by contrast, those from the chromosphere and transition region have less variability in SC24. We therefore suggest that, the empirical relation between solar EUV and P, which is derived from observations in previous solar cycles, may not adapt to SC24. The changes in EUV spectrum need to be considered in the models for aeronomic study, especially those using F10.7 index as an input parameter.

  2. Surface modification of organic polymer by dual action of extreme ultraviolet/visible-near infrared ultrashort pulses

    NASA Astrophysics Data System (ADS)

    Mocek, T.; Polan, J.; Homer, P.; Jakubczak, K.; Rus, B.; Kim, I. J.; Kim, C. M.; Lee, G. H.; Nam, C. H.; Hájková, V.; Chalupský, J.; Juha, L.

    2009-01-01

    We present the experimental evidence of structural surface modifications of poly(methyl methacrylate) (PMMA) caused by simultaneous action of extreme ultraviolet (XUV) (˜21 nm) and visible-near infrared (visible-NIR) (820/410 nm) ultrashort pulses. Although the fluence of each individual beam was far below the surface modification threshold, very efficient and specific material expansion was observed after irradiation of PMMA by more than ˜20 shots of mixed XUV/visible-NIR radiation. As the XUV photons generate free charge carriers, absorption of the optical radiation dramatically increases, which heats up the material and further enhances the XUV induced damage to the polymer chain.

  3. Surface modification of organic polymer by dual action of extreme ultraviolet/visible-near infrared ultrashort pulses

    SciTech Connect

    Mocek, T.; Polan, J.; Homer, P.; Jakubczak, K.; Rus, B.; Kim, I. J.; Kim, C. M.; Lee, G. H.; Nam, C. H.; Hajkova, V.; Chalupsky, J.; Juha, L.

    2009-01-15

    We present the experimental evidence of structural surface modifications of poly(methyl methacrylate) (PMMA) caused by simultaneous action of extreme ultraviolet (XUV) ({approx}21 nm) and visible-near infrared (visible-NIR) (820/410 nm) ultrashort pulses. Although the fluence of each individual beam was far below the surface modification threshold, very efficient and specific material expansion was observed after irradiation of PMMA by more than {approx}20 shots of mixed XUV/visible-NIR radiation. As the XUV photons generate free charge carriers, absorption of the optical radiation dramatically increases, which heats up the material and further enhances the XUV induced damage to the polymer chain.

  4. Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources

    DOEpatents

    Kubiak, Glenn D.; Bernardez, II, Luis J.

    2000-01-04

    A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.

  5. Chang'e-3 Extreme Ultraviolet Camera Observations of the Dynamics of the Earth's Plasmasphere

    NASA Astrophysics Data System (ADS)

    Fok, M. C. H.; Zhang, X.; He, F.; Chen, B.; Wang, H. N.; Shen, C.; Ping, J.; Nakano, S.

    2015-12-01

    The Moon-based Extreme Ultraviolet Camera (EUVC) aboard China's Chang'e-3 (CE-3) lunar lander has successfully imaged the global plasmasphere on the Moon for the first time through detecting the resonantly scattered sunlight by plasmaspheric He+ at 30.4 nm with a spatial resolution of 0.1 RE and a time resolution of 10 min. The characteristics and the analyzing methods of the EUVC images are introduced in detail in this report. The plasmapause locations on the magnetic equator are reconstructed with the Minimum L Algorithm and are quantitatively compared with those extracted from in-situ observations by DMSP, THEMIS, and RBSP satellites. Then the plasmapause evolutions during substorms on February 21 2014 and April 21 2014 are investigated. It is found that the evolutions of plasmapause correlate well in both universal time and magnetic local time with the equatorial boundaries of auroral oval during substorms. During these two cases, the solar-wind-driven convection and the geomagnetic activity are relatively weak and steady, and the plasmapause motions can reliably be attributed to the substorms. It is proposed that correlations between the auroral signatures and the plasmapause motions may be due to the generation and Earthward-propagation of dipolarization front and resultant pitch angle scattering. In future work, we will search more in-situ and remote sensing data in both the plasmasphere and the magnetotail regions to investigate the correlations between the plasmaspheric erosions, the dipolarization fronts, and the energetic ions injections.

  6. Optical proximity correction for extreme ultra-violet mask with pellicle

    NASA Astrophysics Data System (ADS)

    Mo, Soo-Yeon; Kim, In-Seon; Oh, Hye-Keun

    2015-10-01

    Extreme ultraviolet (EUV) lithography is considered as one of the viable solutions for production of the next generation integrated devices. EUV mask defect control becomes more critical issue in order to sustain the quality of wafer fabrication process. Since pellicle is the essential component to prevent patterning deformations caused by particle defects on EUV mask[1-2], EUV OPC (optical proximity correction) that takes into account for pellicle effects on imaging quality is required for achieving better pattern fidelity and critical dimension control. In this study, image blurring effect induced by the EUV mask pellicle on mask pattern structures was investigated and it was found that the localized short-range OPC using commercial software performed as desired considering transmission intensity loss due to pellicle. For experiment, edge placement error differences of the same 2D logic patterns with 16 nm half pitch with and without pellicle were compared. Finally, a method was suggested how patterning throughput loss caused by the transmission loss can be compensated by EUV OPC, which may allow pellicle transmission even below 90%.

  7. Plasma physics and radiation hydrodynamics in developing an extreme ultraviolet light source for lithography

    SciTech Connect

    Nishihara, Katsunobu; Nunami, Masanori; Fujioka, Shinsuke; Furukawa, Hiroyuki; Murakami, Masakatsu; Zhakhovskii, Vasilii; Gamata, Kouhei; Takata, Akira; Ueda, Hirofumi; Nishimura, Hiroaki; Izawa, Yasukazu; Miyanaga, Noriaki; Mima, Kunoki; Sunahara, Atsushi; Shimada, Yoshinori; Sasaki, Akira; Tanuma, Hajime; Fujima, Kazumi; Kato, Takako; More, Richard

    2008-05-15

    Extreme ultraviolet (EUV) radiation from laser-produced plasma (LPP) has been thoroughly studied for application in mass production of next-generation semiconductor devices. One critical issue for the realization of an LPP-EUV light source for lithography is the conversion efficiency (CE) from incident laser power to EUV radiation of 13.5-nm wavelength (within 2% bandwidth). Another issue is solving the problem of damage caused when debris reaches an EUV collecting mirror. Here, we present an improved power balance model, which can be used for the optimization of laser and target conditions to obtain high CE. An integrated numerical simulation code has been developed for the target design. The code agrees well with experimental results not only for CE but also for detailed EUV spectral structure. We propose a two-pulse irradiation scheme for high CE, and reduced ion debris using a carbon dioxide laser and a droplet or a punch-out target. Using our benchmarked numerical simulation code, we find a possibility to obtain CE up to 6-7%, which is more than twice that achieved to date. We discuss the reduction of ion energy within the two-pulse irradiation scheme. The mitigation of energetic ions by a magnetic field is also discussed, and we conclude that no serious instability occurs due to large ion gyroradius.

  8. Cancer cell classification with coherent diffraction imaging using an extreme ultraviolet radiation source

    PubMed Central

    Zürch, Michael; Foertsch, Stefan; Matzas, Mark; Pachmann, Katharina; Kuth, Rainer; Spielmann, Christian

    2014-01-01

    Abstract. In cancer treatment, it is highly desirable to classify single cancer cells in real time. The standard method is polymerase chain reaction requiring a substantial amount of resources and time. Here, we present an innovative approach for rapidly classifying different cell types: we measure the diffraction pattern of a single cell illuminated with coherent extreme ultraviolet (XUV) laser-generated radiation. These patterns allow distinguishing different breast cancer cell types in a subsequent step. Moreover, the morphology of the object can be retrieved from the diffraction pattern with submicron resolution. In a proof-of-principle experiment, we prepared single MCF7 and SKBR3 breast cancer cells on gold-coated silica slides. The output of a laser-driven XUV light source is focused onto a single unstained and unlabeled cancer cell. With the resulting diffraction pattern, we could clearly identify the different cell types. With an improved setup, it will not only be feasible to classify circulating tumor cells with a high throughput, but also to identify smaller objects such as bacteria or even viruses. PMID:26158049

  9. Influence of laser pulse duration on extreme ultraviolet and ion emission features from tin plasmas

    SciTech Connect

    Roy, A. E-mail: aroy@barc.gov.in; Harilal, S. S.; Polek, M. P.; Hassan, S. M.; Hassanein, A.; Endo, A.

    2014-03-15

    We investigated the role of laser pulse duration and intensity on extreme ultraviolet (EUV) generation and ion emission from a laser produced Sn plasma. For producing plasmas, planar slabs of pure Sn were irradiated with 1064 nm Nd:YAG laser pulses with varying pulse duration (5–20 ns) and intensity. Experimental results performed at CMUXE indicate that the conversion efficiency (CE) of the EUV radiation strongly depend on laser pulse width and intensity, with a maximum CE of ∼2.0% measured for the shortest laser pulse width used (5 ns). Faraday Cup ion analysis of Sn plasma showed that the ion flux kinetic profiles are shifted to higher energy side with the reduction in laser pulse duration and narrower ion kinetic profiles are obtained for the longest pulse width used. However, our initial results showed that at a constant laser energy, the ion flux is more or less constant regardless of the excitation laser pulse width. The enhanced EUV emission obtained at shortest laser pulse duration studied is related to efficient laser-plasma reheating supported by presence of higher energy ions at these pulse durations.

  10. Optimization of electrostatic chuck for mask-blank flatness control in extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Shu, Emily Y.

    2007-05-01

    Overlay requirements of Extreme Ultra-violet Lithography (EUVL) dictate reticle flatness errors of 50nm or less. During the early phase of EUVL development, it was decided that an electrostatic chuck was required to flatten EUVL masks to these specifications. However current experience and test data have demonstrated that it will be very difficult to reach the desired mask flatness goal without a thorough understanding and advanced control of the echucking process. The results of a parametric model study are reported in this paper. In this study we calculated the chucking force dependence of activating voltage, e-chuck geometry, film material, and pin design, and then proposed an optimized chuck design. We have also engaged in a material study for the mask backside coating for the purpose of reducing flatness errors and minimizing backside particle generation. We have also designed and built an automated, vacuum based, interferometric metrology tool to enable e-chucking experimentation. An early status report of this tool will be included in this paper.

  11. Analytical treatment of the deformation behavior of extreme-ultraviolet-lithography masks during electrostatic chucking

    NASA Astrophysics Data System (ADS)

    Brandstetter, Gerd; Govindjee, Sanjay

    2012-10-01

    A new analytical approach is presented to predict mask deformation during electrostatic chucking in next-generation extreme-ultraviolet-lithography. Given an arbitrary profile measurement of the mask and chuck nonflatness, this method has been developed as an alternative to time-consuming finite element simulations for overlay error correction algorithms. We consider the feature transfer of each harmonic component in the profile shapes via linear elasticity theory and demonstrate analytically how high spatial frequencies are filtered. The method is compared to presumably more accurate finite element simulations and has been tested successfully in an overlay error compensation experiment, where the residual error y-component could be reduced by a factor of 2. As a side outcome, the formulation provides a tool to estimate the critical pin-size and -pitch such that the distortion on the mask front-side remains within given tolerances. We find for a numerical example that pin-pitches of less than 5 mm will result in a mask pattern distortion of less than 1 nm if the chucking pressure is below 30 kPa.

  12. Capturing the Magnetic and Structural Phase Transition of Ferh using Extreme Ultraviolet Light

    NASA Astrophysics Data System (ADS)

    Zusin, Dmitriy; Grychtol, Patrik; Gentry, Christian; Murnane, Margaret; Kapteyn, Henry; Canton, Sophie; Knut, Ronny; Shaw, Justin; Nembach, Hans; Silva, Thomas; Ceballos, Alejandro; Bordel, Catherine; Fischer, Peter; Hellman, Frances

    2015-03-01

    The temperature dependent transition from the anti-ferromagnetic to the ferromagnetic phase in FeRh is accompanied by a modification of its crystal lattice. The interplay between the magnetic and the structural transition is a matter of strong debate. It is important to better understand the mechanism(s) of the transition since it can be induced by femtosecond laser pulses and, unlike slower (nanosecond) magnetic phase transitions, does not seem to be limited by heat transfer. In this work, we use extreme ultraviolet light generated by a tabletop high harmonics source to perform element-selective investigations of the temperature-dependent magneto-optical response of a thin film FeRh sample. We study the optically induced phase transition using two ultrafast pump-probe spectroscopy approaches: by monitoring the time-resolved transversal magneto-optical Kerr effect (T-MOKE) and the transient change in reflectivity. PF acknowledges support from BES MSD DOE # DE-AC02-05-CH11231 and LFRIR program (# 2012K1A4A3053565) through NRF Korea funded by MEST, and JILA from DOE # DE-FG02-09ER4665.

  13. Real-time and Sub-wavelength Ultrafast Coherent Diffraction Imaging in the Extreme Ultraviolet

    PubMed Central

    Zürch, M.; Rothhardt, J.; Hädrich, S.; Demmler, S.; Krebs, M.; Limpert, J.; Tünnermann, A.; Guggenmos, A.; Kleineberg, U.; Spielmann, C.

    2014-01-01

    Coherent Diffraction Imaging is a technique to study matter with nanometer-scale spatial resolution based on coherent illumination of the sample with hard X-ray, soft X-ray or extreme ultraviolet light delivered from synchrotrons or more recently X-ray Free-Electron Lasers. This robust technique simultaneously allows quantitative amplitude and phase contrast imaging. Laser-driven high harmonic generation XUV-sources allow table-top realizations. However, the low conversion efficiency of lab-based sources imposes either a large scale laser system or long exposure times, preventing many applications. Here we present a lensless imaging experiment combining a high numerical aperture (NA = 0.8) setup with a high average power fibre laser driven high harmonic source. The high flux and narrow-band harmonic line at 33.2 nm enables either sub-wavelength spatial resolution close to the Abbe limit (Δr = 0.8λ) for long exposure time, or sub-70 nm imaging in less than one second. The unprecedented high spatial resolution, compactness of the setup together with the real-time capability paves the way for a plethora of applications in fundamental and life sciences. PMID:25483626

  14. Cancer cell classification with coherent diffraction imaging using an extreme ultraviolet radiation source.

    PubMed

    Zürch, Michael; Foertsch, Stefan; Matzas, Mark; Pachmann, Katharina; Kuth, Rainer; Spielmann, Christian

    2014-10-01

    In cancer treatment, it is highly desirable to classify single cancer cells in real time. The standard method is polymerase chain reaction requiring a substantial amount of resources and time. Here, we present an innovative approach for rapidly classifying different cell types: we measure the diffraction pattern of a single cell illuminated with coherent extreme ultraviolet (XUV) laser-generated radiation. These patterns allow distinguishing different breast cancer cell types in a subsequent step. Moreover, the morphology of the object can be retrieved from the diffraction pattern with submicron resolution. In a proof-of-principle experiment, we prepared single MCF7 and SKBR3 breast cancer cells on gold-coated silica slides. The output of a laser-driven XUV light source is focused onto a single unstained and unlabeled cancer cell. With the resulting diffraction pattern, we could clearly identify the different cell types. With an improved setup, it will not only be feasible to classify circulating tumor cells with a high throughput, but also to identify smaller objects such as bacteria or even viruses. PMID:26158049

  15. Characterization of gas targets for laser produced extreme ultraviolet plasmas with a Hartmann-Shack sensor

    SciTech Connect

    Peth, Christian; Kranzusch, Sebastian; Mann, Klaus; Vioel, Wolfgang

    2004-10-01

    A table top extreme ultraviolet (EUV)-source was developed at Laser-Laboratorium Goettingen for the characterization of optical components and sensoric devices in the wavelength region from 11 to 13 nm. EUV radiation is generated by focusing the beam of a Q-switched Nd:YAG laser into a pulsed xenon gas jet. Since a directed gas jet with a high number density is needed for an optimal performance of the source, conical nozzles with different cone angles were drilled with an excimer laser to produce a supersonic gas jet. The influence of the nozzle geometry on the gas jet was characterized with a Hartmann-Shack wave front sensor. The deformation of a planar wave front after passing the gas jet was analyzed with this sensor, allowing a reconstruction of the gas density distribution. Thus, the gas jet was optimized resulting in an increase of EUV emission by a factor of two and a decrease of the plasma size at the same time.

  16. Charge Carrier Dynamics in Transition Metal Oxides Studied by Femtosecond Transient Extreme Ultraviolet Absorption Spectroscopy

    NASA Astrophysics Data System (ADS)

    Jiang, Chang-Ming

    With the ability to disentangle electronic transitions that occur on different elements and local electronic structures, time-resolved extreme ultraviolet (XUV) spectroscopy has emerged as a powerful tool for studying ultrafast dynamics in condensed phase systems. In this dissertation, a visible-pump/XUV-probe transient absorption apparatus with femtosecond resolution was constructed to investigate the carrier relaxation dynamics in semiconductors after photo-excitation. This includes timescales for carrier thermalization by carrier-carrier and carrier-phonon scattering. The 30 -- 72 eV photon energy coverage (17 -- 40 nm wavelength) generated by a table-top XUV light source is suitable for probing the 3p-to-3d core level absorptions of various transition metal oxides (TMOs) with specificities to elements and oxidation states. In Chapter 1, a brief introduction to charge carrier dynamics in semiconductor-based materials is given. In addition, fundamentals of core-level spectroscopy and the high harmonic generation (HHG) process are also addressed in this introductory chapter. Specifications of the experimental apparatus that was constructed are summarized in Chapter 2, including the design concepts and characterization of performance. Chapter 3 presents the spectral tunability of the XUV pulses generated from a semi-infinite gas cell (SIGC), as well as the data acquisition procedures. Charge carrier relaxation dynamics in Co3O4 following the charge transfer excitation pathway at 400 nm are documented in Chapter 4. In Chapter 5, various visible pump wavelengths are used to excite Co3O4 and the differences in the carrier dynamics versus excitation wavelength are considered. After selectively photoexciting a Si/TiO2 heterojunction, the resulted electron transfer process is observed and reported in Chapter 6. The concluding remarks of the dissertation are made in Chapter 7, while several ongoing time-resolved experiments are addressed in the Appendix sections.

  17. A PSF equalization technique for the Multi-Order Solar Extreme-ultraviolet Spectrograph (MOSES)

    NASA Astrophysics Data System (ADS)

    Atwood, Shane; Kankelborg, Charles

    2015-10-01

    The Multi-Order Solar Extreme Ultraviolet Spectrograph (MOSES) is a rocket-borne slitless imaging spectrometer, designed to observe He II (30.4 nm) emission in the solar transition region. This instrument forms three simultaneous images at spectral orders m=-1, 0, +1 over an extended field of view (FOV). A multi-layer coating on the grating and thin film filters in front of the detectors defines the instrument passband. Each image contains a unique combination of spectral and spatial information. Our overarching goal in analyzing these data is to estimate a spectral line profile at every point in the FOV. Each spectral order has different image geometry, and therefore different aberrations. Since the point spread function (PSF) differs between any two images, systematic errors are introduced when we use all three images together to invert for spectral line profiles. To combat this source of systematic error, we have developed a PSF equalization scheme. Determination of the image PSFs is impractical for several reasons, including changes that may occur due to vibration during both launch and recovery operations. We have therefore developed a strategy using only the solar images obtained during flight to generate digital filters that modify each image so that they have the same effective PSF. Generation of the PSF equalization filters does not require that the PSFs themselves be known. Our approach begins with the assumption that there are only two things that cause the power spectra of our images to differ: (1) aberrations; and (2) the FOV average spectral line profile, which is known in principle from an abundance of historical data. To validate our technique, we generate three synthetic images with three different PSFs. We compare PSF equalizations performed without knowledge of the PSF to corrections performed with that knowledge. Finally, we apply PSF equalization to solar images obtained in the 2006 MOSES flight and demonstrate the removal of artifacts.

  18. Calibration of a microchannel plate based extreme ultraviolet grazing incident spectrometer at the Advanced Light Source.

    PubMed

    Bakeman, M S; van Tilborg, J; Sokollik, T; Baum, D; Ybarrolaza, N; Duarte, R; Toth, C; Leemans, W P

    2010-10-01

    We present the design and calibration of a microchannel plate based extreme ultraviolet spectrometer. Calibration was performed at the Advance Light Source (ALS) at the Lawrence Berkeley National Laboratory (LBNL). This spectrometer will be used to record the single shot spectrum of radiation emitted by the tapered hybrid undulator (THUNDER) undulator installed at the LOASIS GeV-class laser-plasma-accelerator. The spectrometer uses an aberration-corrected concave grating with 1200 lines/mm covering 11-62 nm and a microchannel plate detector with a CsI coated photocathode for increased quantum efficiency in the extreme ultraviolet. A touch screen interface controls the grating angle, aperture size, and placement of the detector in vacuum, allowing for high-resolution measurements over the entire spectral range. PMID:21034012

  19. The Third Extreme Ultraviolet Explorer Right Angle Program Catalog: The Last Years

    NASA Astrophysics Data System (ADS)

    Christian, Damian J.

    2002-12-01

    We present 63 new extreme-ultraviolet sources from observations taken during the Right Angle Program (RAP) of the Extreme Ultraviolet Explorer (EUVE). This paper concentrates on data taken in the last years of the RAP, 1999 and 2000, with a sky coverage of 7%. We present sample light curves for several sources, including flare detections from the previously uncataloged source EUVE J0613-23.9B, the active late-type star EUVE J0728-20.9 (V372 Pup), and the cataclysmic variable EUVE J0332-25.9 (VY For). This final RAP catalog, combined with the EUVE all-sky survey, Lampton et al. faint list, and previous RAP catalogs, brings the total number of EUVE sources to nearly 1200.

  20. Supersonic cluster jet source for debris-free extreme ultraviolet production

    SciTech Connect

    Kubiak, G.D.; Bernardez, L.J.

    1997-09-01

    The supersonic cluster jet has been developed and characterized for use as a target medium to produce a clean source of extreme ultraviolet radiation for extreme ultraviolet lithography and other applications. Spectroscopic characterization of the laser plasma emission produced from Xe, O{sub 2} and Kr cluster gas targets has been performed. Xe is the most efficient target gas, exhibiting a conversion efficiency at 13.5 nm of 0.8% into the relevant 2.5% spectral bandwidth. The other target gases are less efficient in the spectral region of interest and, in the case of oxygen, emit {approximately}5 times less off-band radiation. The angular distribution of the Xe plasma emission has also been characterized.

  1. X-ray and extreme ultraviolet imaging using layered synthetic microstructures

    NASA Technical Reports Server (NTRS)

    Underwood, J. H.; Barbee, T. W.; Shealy, D. L.

    1982-01-01

    Up to now designers of X-ray optical instruments such as microscopes and telescopes have been compelled to use mirrors operating at small glancing angles. However, using vapor deposition techniques, it is now possible to build multilayered thin film structures in which the individual layers have thicknesses comparable with a wavelength of X-rays. These devices operate in a manner exactly analogous to multilayer dielectric coatings at visible wavelengths and can be used to increase the X-ray and extreme ultraviolet reflectivity of surfaces at large glancing angles. These X-ray mirrors have numerous potential applications in X-ray optics. Attention is given to X-ray images with a normal incidence mirror, and applications of multilayer optics. Single-mirror telescopes for solar/stellar astronomy are discussed, taking into account solar corona and transition region studies, and X-ray and extreme ultraviolet astronomy. Hybrid X-ray telescopes are also considered.

  2. Actinic detection of sub-100 nm defects on extreme ultraviolet lithography mask blanks

    SciTech Connect

    Jeong, Seongtae; Johnson, Lewis; Rekawa, Seno; Walton, Chris C.; Prisbrey, Shon T.; Tejnil, Edita; Underwood, James H.; Bokor, Jeffrey; EECS Department, University of California, Berkeley, California 94720

    1999-11-01

    We present recent experimental results from a prototype actinic (operates at the 13 nm extreme ultraviolet wavelength) defect inspection system for extreme ultraviolet lithography mask blanks. The defect sensitivity of the current actinic inspection system is shown to reach 100 nm in experiments with programmed defects. A method to cross register and cross correlate between the actinic inspection system and a commercial visible-light scattering defect inspection system is also demonstrated. Thus, random, native defects identified using the visible-light tool can reliably be found and scanned by our actinic tool. We found that native defects as small as 86 nm (as classified by the visible-light tool) were detectable by the actinic tool. These results demonstrate the capability of this tool for independent defect counting experiments. (c) 1999 American Vacuum Society.

  3. Extreme ultraviolet marking system for anti-counterfeiting tags with adjustable security level

    NASA Astrophysics Data System (ADS)

    Di Lazzaro, P.; Bollanti, S.; Flora, F.; Mezi, L.; Murra, D.; Torre, A.; Bonfigli, F.; Montereali, R. M.; Vincenti, M. A.

    2012-01-01

    We present a recently patented apparatus which consists of an extreme ultraviolet radiation source writing invisible patterns on thin tags of alkali halides. The tags patterned using this method are almost impossible to counterfeit, and offer a much better protection against fakes than available anti-counterfeiting techniques. We will discuss if this novel technology is ready for industrial production of anti-counterfeiting tags.

  4. A NOISE ADAPTIVE FUZZY EQUALIZATION METHOD FOR PROCESSING SOLAR EXTREME ULTRAVIOLET IMAGES

    SciTech Connect

    Druckmueller, M.

    2013-08-15

    A new image enhancement tool ideally suited for the visualization of fine structures in extreme ultraviolet images of the corona is presented in this paper. The Noise Adaptive Fuzzy Equalization method is particularly suited for the exceptionally high dynamic range images from the Atmospheric Imaging Assembly instrument on the Solar Dynamics Observatory. This method produces artifact-free images and gives significantly better results than methods based on convolution or Fourier transform which are often used for that purpose.

  5. Apollo-Soyuz test project Extreme Ultraviolet Telescope MA-083. [stellar spectra

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1978-01-01

    Follow-on studies to the Apollo-Soyuz Extreme Ultraviolet Telescope experiment (MA-083) include analyses of individual target stars or classes of stars, not only with regard to the EUV data but also in connection with theoretical models and observations in other parts of the spectrum. Topics discussed include: observations of SS Cygni, Proxima Centauri, HZ 43, and Feige 24; computer searches for new EUV sources; Sirius: models and inferences; EUV emission from a hot gas; and the diffuse EUV background.

  6. Bright subcycle extreme ultraviolet bursts from a single dense relativistic electron sheet.

    PubMed

    Ma, W J; Bin, J H; Wang, H Y; Yeung, M; Kreuzer, C; Streeter, M; Foster, P S; Cousens, S; Kiefer, D; Dromey, B; Yan, X Q; Meyer-ter-Vehn, J; Zepf, M; Schreiber, J

    2014-12-01

    Double-foil targets separated by a low density plasma and irradiated by a petawatt-class laser are shown to be a copious source of coherent broadband radiation. Simulations show that a dense sheet of relativistic electrons is formed during the interaction of the laser with the tenuous plasma between the two foils. The coherent motion of the electron sheet as it transits the second foil results in strong broadband emission in the extreme ultraviolet, consistent with our experimental observations. PMID:25526132

  7. High-resolution extreme-ultraviolet spectroscopy of potassium using anti-Stokes radiation

    NASA Technical Reports Server (NTRS)

    Rothenberg, J. E.; Young, J. F.; Harris, S. E.

    1981-01-01

    The use of a new extreme-ultraviolet radiation source based on spontaneous anti-Stokes scattering for high-resolution absorption spectroscopy of transition originating from the 3p6 shell of potassium is reported. The region from 546.6 to 536.8 A is scanned at a resolution of about 1.2 Kayser. Within this region, four previously unreported lines are observed.

  8. Design, fabrication, and characterization of high-efficiency extreme ultraviolet diffusers

    SciTech Connect

    Naulleau, Patrick P.; Liddle, J. Alexander; Salmassi, Farhad; Anderson, Erik H.; Gullikson, Eric M.

    2004-02-19

    As the development of extreme ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. The strong absorption of EUV by most materials and its extremely short wavelength, however, makes it very difficult to implement many components that are commonplace in the longer wavelength regimes. One such example is the diffuser often implemented with ordinary ground glass in the visible light regime. Here we demonstrate the fabrication of reflective EUV diffusers with high efficiency within a controllable bandwidth. Using these techniques we have fabricated diffusers with efficiencies exceeding 10% within a moderate angular single-sided bandwidth of approximately 0.06 radians.

  9. Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency.

    PubMed

    Bergmann, K; Rosier, O; Neff, W; Lebert, R

    2000-08-01

    An extreme-ultraviolet radiation source based on a xenon pinch plasma is discussed with respect to the demands on a radiation source for extreme-ultraviolet lithography. Operation of the discharge in a self-igniting-plasma mode and omitting a switch permits a very effective and low-inductive coupling of the electrically stored energy to the electrode system. The xenon plasma exhibits broadband emission characteristics that offer radiation near 11 and 13 nm. Both wavelengths are useful in combination with beryllium- and silicon-based multilayer mirrors. The plasma emits approximately 74 mW/sr at 11.5 nm and 40 mW/sr at 13.5 nm in a bandwidth of 2% when operated at a repetition frequency of 120 Hz. The source size is less than 500 microm in diameter (FWHM) when viewed from the axial direction. The pulse-to-pulse stability is better than 3.6%. First results with a repetition rate of as much as 6 kHz promise the possibility of scaling to the required emission power for extreme-ultraviolet lithography. PMID:18349959

  10. The extreme ultraviolet imager of solar orbiter: optical design and alignment scheme

    NASA Astrophysics Data System (ADS)

    Halain, J.-P.; Mazzoli, A.; Meining, S.; Rochus, P.; Renotte, E.; Auchère, F.; Schühle, U.; Delmotte, F.; Dumesnil, C.; Philippon, A.; Mercier, R.; Hermans, A.

    2015-09-01

    The Extreme Ultraviolet Imager (EUI) is one of the remote sensing instruments on-board the Solar Orbiter mission. It will provide dual-band full-Sun images of the solar corona in the extreme ultraviolet (17.1 nm and 30.4 nm), and high resolution images of the solar disk in both extreme ultraviolet (17.1 nm) and vacuum ultraviolet (Lyman-alpha 121.6 nm). The EUI optical design takes heritage of previous similar instruments. The Full Sun Imager (FSI) channel is a single mirror Herschel design telescope. The two High Resolution Imager (HRI) channels are based on a two-mirror optical refractive scheme, one Ritchey-Chretien and one Gregory optical design for the EUV and the Lyman-alpha channels, respectively. The spectral performances of the EUI channels are obtained thanks to dedicated mirror multilayer coatings and specific band-pass filters. The FSI channel uses a dual-band mirror coating combined with aluminum and zirconium band-pass filters. The HRI channels use optimized band-pass selection mirror coatings combined with aluminum band-pass filters and narrow band interference filters for Lyman-alpha. The optical performances result from accurate mirror manufacturing tolerances and from a two-step alignment procedure. The primary mirrors are first co-aligned. The HRI secondary mirrors and focal planes positions are then adjusted to have an optimum interferometric cavity in each of these two channels. For that purpose a dedicated alignment test setup has been prepared, composed of a dummy focal plane assembly representing the detector position. Before the alignment on the flight optical bench, the overall alignment method has been validated on the Structural and Thermal Model, on a dummy bench using flight spare optics, then on the Qualification Model to be used for the system verification test and qualifications.