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Sample records for grown nio thin

  1. Continuous spin reorientation transition in epitaxially grown antiferromagnetic NiO thin films

    SciTech Connect

    Li, J.; Arenholz, E.; Meng, Y.; Tan, A.; Park, J.; Jin, E.; Son, H.; Wu, J.; Jenkins, C. A.; Scholl, A.; Hwang, Chanyong; Qiu, Z. Q.

    2011-03-01

    Fe/NiO/MgO/Ag(001) films were grown epitaxially, and the Fe and NiO spin orientations were determined using x-ray magnetic dichroism. We find that the NiO spins are aligned perpendicularly to the in-plane Fe spins. Analyzing both the in-plane and out-of-plane spin components of the NiO layer, we demonstrate unambiguously that the antiferromagnetic NiO spins undergo a continuous spin reorientation transition from the in-plane to out-of-plane directions with increasing of the MgO thickness.

  2. Resistance switching in a single-crystalline NiO thin film grown on a Pt0.8Ir0.2 electrode

    NASA Astrophysics Data System (ADS)

    Kawai, Masanori; Ito, Kimihiko; Shimakawa, Yuichi

    2009-07-01

    A single-crystalline NiO thin film was grown epitaxially on an atomically flat Pt0.8Ir0.2 bottom electrode layer grown epitaxially on a SrTiO3(100) substrate. The memory cells of the single-crystalline NiO thin film with Pt top electrodes showed unipolar resistance switching behaviors. The result demonstrates that a unipolar resistance switching is not a characteristic phenomenon in the polycrystalline NiO but it can also occur in the single-crystalline NiO.

  3. Structural Properties and Resistance-Switching Behavior of Thermally Grown NiO Thin Films

    NASA Astrophysics Data System (ADS)

    Kim, Dong-Wook; Jung, Ranju; Park, Bae Ho; Li, Xiang-Shu; Park, Chanwoo; Shin, Seongmo; Kim, Dong-Chirl; Lee, Chang Won; Seo, Sunae

    2008-03-01

    We investigated the structural and electrical properties of polycrystalline NiO thin films on Pt electrodes formed by thermal oxidation. A Ni-Pt alloy phase was found at the interface, which could be explained by the oxidation kinetics and reactions of Ni, NiO, and Pt. An increase in the oxidation temperature decreased the volume of the alloy layer and improved the crystalline quality of the NiO thin films. Pt/NiO/Pt structures were fabricated, and they showed reversible resistance switching from a high-resistance state (HRS) to a low-resistance state (LRS) and vice versa during unipolar current-voltage measurements. The oxidation temperature affected (did not affect) the HRS (LRS) resistance of the Pt/NiO/Pt structures. This indicated that the transport characteristics of HRS and LRS should be different.

  4. Surface electronic structure of polar NiO thin film grown on Ag(111)

    NASA Astrophysics Data System (ADS)

    Das, Jayanta; Menon, Krishnakumar S. R.

    2015-06-01

    The growth and structure of NiO thin films on top of Ag(111) substrate were studied where the formation of faceted surface was confirmed by Low Energy Electron Diffraction. The electronic structure of polar NiO(111) surface has been probed using photoemission techniques. The core energy levels and the valence band electronic structure were excited by x-ray and ultraviolet photons respectively. The modifications in physical structure and valence band electronic structure of the film under vacuum annealing have also been enlightened.

  5. Surface electronic structure of polar NiO thin film grown on Ag(111)

    SciTech Connect

    Das, Jayanta; Menon, Krishnakumar S. R.

    2015-06-24

    The growth and structure of NiO thin films on top of Ag(111) substrate were studied where the formation of faceted surface was confirmed by Low Energy Electron Diffraction. The electronic structure of polar NiO(111) surface has been probed using photoemission techniques. The core energy levels and the valence band electronic structure were excited by x-ray and ultraviolet photons respectively. The modifications in physical structure and valence band electronic structure of the film under vacuum annealing have also been enlightened.

  6. Resistance Switching Behavior in Epitaxially Grown NiO

    NASA Astrophysics Data System (ADS)

    Lee, S. R.; Bak, J. H.; Park, Y. D.; Char, K.; Kim, D. C.; Jung, R.; Seo, S.; Li, X. S.; Park, G.-S.; Yoo, I. K.

    2008-03-01

    Reproducible resistance switching behavior has been found in NiO films prepared by a pulsed laser deposition system. The I-V measurements of epitaixally grown NiO on SrRuO3 electrode show a bipolar resistive memory switching behavior, in contrast with a unipolar switching behavior of polycrystalline NiO on Pt electrode. In order to understand the resistive memory switching mechanism in NiO, the I-V characteristics and memory switching property of epitaxial NiO prepared under various synthesis conditions and electrodes has been investigated. The IV measurements at room temperature suggest that the interface between NiO and the electrode plays an important role on the resistive switching phenomena. To analyze the role of the interface, our efforts to control the interfaces and to measure the I-V characteristics at low temperature will be presented.

  7. Properties of NiO thin films deposited by intermittent spray pyrolysis process

    NASA Astrophysics Data System (ADS)

    Reguig, B. A.; Khelil, A.; Cattin, L.; Morsli, M.; Bernède, J. C.

    2007-02-01

    NiO thin films have been grown on glass substrates by intermittent spray pyrolysis deposition of NiCl 2·6H 2O diluted in distilled water, using a simple "perfume atomizer". The effect of the solution molarity on their properties was studied and compared to those of NiO thin films deposited with a classical spray system. It is shown that NiO thin films crystallized in the NiO structure are achieved after deposition. Whatever the precursor molarity, the grain size is around 25-30 nm. The crystallites are preferentially oriented along the (1 1 1) direction. All the films are p-type. However, the thickness and the conductivity of the NiO films depend on the precursor contraction. By comparison with the properties of films deposited by classical spray technique, it is shown that the critical precursor concentration, which induces strong thin films properties perturbations, is higher when a perfume atomizer is used. This broader stability domain can be attributed to better chlorides decomposition during the rest time used in the perfume atomizer technique.

  8. Hydrogen Microsensor Based on NiO Thin Films

    NASA Astrophysics Data System (ADS)

    Fasaki, I.; Antoniadou, M.; Giannoudakos, A.; Stamataki, M.; Kompitsas, M.; Roubani-Kalantzopoulou, F.; Hotovy, I.; Rehacek, V.

    A multitude of industries use H2 either as part of their process or as a fuel. All these applications motivate nowadays the development of hydrogen sensor devices which enable its safe and controlled use. Since H2 is explosive above the lower explosion limit at 40,000 ppm, devices which permit the detection of its presence and measure its concentration become indispensable. In this work, we present a microsensor based on NiO thin films produced with dc reactive magnetron sputtering on GaAs, with an incorporated Pt heater, all on a DO-8 package ready for use. The microsensor was tested to H2 concentrations 5,000 and 10,000 ppm at different working temperatures. The change of the electrical resistance of NiO thin films was the signal for hydrogen sensing. The response of the sensor was not proportional to concentration of the gas neither to the working temperature.

  9. Surface phonons of NiO(001) ultrathin films grown pseudomorphically on Ag(001)

    NASA Astrophysics Data System (ADS)

    Kostov, K. L.; Polzin, S.; Schumann, F. O.; Widdra, W.

    2016-01-01

    For an ultrathin NiO(001) film of 4 monolayer (ML) thickness grown on Ag(001), the vibrational properties have been determined by high-resolution electron energy loss spectroscopy (HREELS). For the well-ordered pseudomorphically grown film, nine phonon modes have been identified and their dispersions have been revealed along the ΓbarΧbar high-symmetry direction. The comparison with phonon data for a 25 ML thick NiO(001) film shows that the NiO(001) phonon properties are already fully developed at 4 ML. Significant differences are found for the surface-localized phonon S6 which has an increased dispersion for the ultrathin film. The dipole-active Fuchs-Kliewer phonon-polariton exhibits a narrower lineshape than the mode found for a single-crystal surface, which might hint to a reduced antiferromagnetic coupling in the ultrathin film.

  10. Ultra smooth NiO thin films on flexible plastic (PET) substrate at room temperature by RF magnetron sputtering and effect of oxygen partial pressure on their properties

    NASA Astrophysics Data System (ADS)

    Nandy, S.; Goswami, S.; Chattopadhyay, K. K.

    2010-03-01

    Transparent p-type nickel oxide thin films were grown on polyethylene terephthalate (PET) and glass substrates by RF magnetron sputtering technique in argon + oxygen atmosphere with different oxygen partial pressures at room temperature. The morphology of the NiO thin films grown on PET and glass substrates was studied by atomic force microscope. The rms surface roughnesses of the films were in the range 0.63-0.65 nm. These ultra smooth nanocrystalline NiO thin films are useful for many applications. High resolution transmission electron microscopic studies revealed that the grains of NiO films on the highly flexible PET substrate were purely crystalline and spherical in shape with diameters 8-10 nm. XRD analysis also supported these results. NiO films grown on the PET substrates were found to have better crystalline quality with fewer defects than those on the glass substrates. The sheet resistances of the NiO films deposited on PET and glass substrates were not much different; having values 5.1 and 5.3 kΩ/□ and decreased to 3.05, 3.1 kΩ/□ respectively with increasing oxygen partial pressure. The thicknesses of the films on both substrates were ˜700 nm. It was also noted that further increase in oxygen partial pressure caused increase in resistivity due to formation of defects in NiO.

  11. Electrochromism of non-stoichiometric NiO thin film: as single layer and in full device

    NASA Astrophysics Data System (ADS)

    Da Rocha, M.; Rougier, A.

    2016-04-01

    Electrochromic properties, known as a reversible modulation of the optical properties under an applied voltage, of NiO thin films are discussed in respect of the film stoichiometry. Using radio-frequency magnetron sputtering, non-stoichiometric "NiO" thin films of good crystallinity were grown at room temperature from low oxygen partial pressure [i.e., above 2 % P(O2/Ar + O2)]. A further increase in oxygen partial pressure leads to conductive brownish films containing a large amount of Ni3+. 2 %-Ni1- x O thin films exhibit significant EC performance in lithium-based electrolyte with a transmittance modulation of 25 %. If it is generally accepted that this optical modulation is due to an insertion of small cations, the presence of additional surface phenomena is also shown. The cycling of full device, based on the association of WO3 and "NiO" in temperature up to 60 °C and down to -35 °C confirms expected increase and decrease in capacity while surprisingly the optical switch from a transparent to a neutral gray color appears slightly modified.

  12. Properties of Li-Doped NiO Thin Films Prepared by RF-Magnetron Sputtering.

    PubMed

    Kwon, Ho-Beom; Han, Joo-Hwan; Lee, Hee Young; Lee, Jai-Yeoul

    2016-02-01

    Li-doped NiO thin films were deposited on glass and c-axis (0001) sapphire single crystal substrates by radio frequency (RF)-niagnetron sputtering. The effects of the type of substrate, substrate temperature and atmosphere on the structural, electrical and optical properties of the NiO thin films were examined. The electrical conductivity of the NiO thin films depends on the type of substrate, substrate temperature and oxygen atmosphere. The electrical conductivity of the thin films on the glass and sapphire substrates was improved by the introduction of oxygen and decreased with increasing substrate temperature. The optical transmittance decreased with the introduction of oxygen and increased with increasing substrate temperature. PMID:27433612

  13. Characteristics of Cu-doped amorphous NiO thin films formed by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Sato, Kazuya; Kim, Sangcheol; Komuro, Shuji; Zhao, Xinwei

    2016-06-01

    Transparent conducting Cu-doped NiO thin films were deposited on quartz glass substrates by radio frequency magnetron spattering. The fabricated thin films were all in amorphous phase. A relatively high transmittance of 73% was achieved. The density ratio of Ni3+/(Ni2+ + Ni3+) ions in the films decreased with increasing O2 gas pressure in the fabrication chamber, which caused a decrease in the carrier concentration of the films. The increasing pressure also led to the increase in Hall mobility. By controlling the chamber pressure and substrate temperature, p-type transparent conducting NiO films with reasonable electrical properties were obtained.

  14. The electrochromic characteristics of sol gel-prepared NiO thin film

    NASA Astrophysics Data System (ADS)

    Jiao, Zheng; Wu, Minghong; Qin, Zheng; Xu, Hong

    2003-04-01

    In this work, NiO thin film was prepared by the sol-gel technique and analysed by thermogravimetry, x-ray diffractometry and x-ray photoelectron spectroscopy. The electrochromic characteristics were studied by ultraviolet spectroscopy. NiO thin film shows electrochromic characteristics. Its colour changes from transparent to brown when a voltage is applied. The transmittance of the film can shift from 90 to 40%. Deterioration of the film caused by colouring and discolouring was not observed for up to 100 cycles.

  15. Characterization of crystalline structure and morphology of NiO thin films.

    PubMed

    Shin, Hyemin; Choi, Soo-Bin; Yu, Chung-Jong; Kim, Jae-Yong

    2011-05-01

    We investigated the relation of sputtering powers with structural and morphological properties of nickel oxide (NiO) thin films. NiO thin films were fabricated by using an rf-reactive sputtering method on Si(100) substrates with a Ni target in a partial pressure of oxygen and argon. The films were deposited by various rf-sputtering powers from 100 to 200 W at room temperature. The phases and crystalline structures of the deposited films were investigated by using grazing incident X-ray diffraction (XRD). The thickness and surface morphology of the films were investigated by using a field emission-scanning electron microscopy (FE-SEM). The different sputtering conditions drastically affected the crystallinity and the surface morphology of NiO thin films. A combined analysis of the data obtained from X-ray diffraction and SEM images demonstrates that the preferred orientation of NiO films tends to grow from (111) to (200) direction as increasing the sputtering power, which can be explained by in terms of the surface energy along the indexing plane in an fcc structure. As increasing the rf power, lattice constants decreased from 4.26 to 4.20 angstroms and samples became high-quality crystals. Under our experimental condition, NiO films prepared at 150 W with 20% partial pressure of oxygen and 7 cm distance from the sample to the target show the best quality of the crystal. PMID:21780511

  16. Transformation from an atomically stepped NiO thin film to a nanotape structure: A kinetic study using x-ray diffraction

    SciTech Connect

    Sakata, Osami

    2008-12-15

    Transformation from an atomically stepped epitaxial thin film of NiO to a self-assemble nanotape structure at the step edge was observed in situ using synchrotron x-ray diffraction. The pristine NiO thin film was epitaxially grown on an ultrasmooth sapphire (0001) substrate with a regular step of 0.2 nm in height using laser molecular beam epitaxy. Transformation from the thin film to the nanotape structure was facilitated by postannealing in air from room temperature to 620 K. From the Arrhenius plot of ln(in-plane domain sizes) versus 1/T, an atomic-scale transformation energy of {approx}0.0135 eV/atom was derived.

  17. Properties of NiO thin films deposited by chemical spray pyrolysis using different precursor solutions

    NASA Astrophysics Data System (ADS)

    Cattin, L.; Reguig, B. A.; Khelil, A.; Morsli, M.; Benchouk, K.; Bernède, J. C.

    2008-07-01

    NiO thin films have been deposited by chemical spray pyrolysis using a perfume atomizer to grow the aerosol. The influence of the precursor, nickel chloride hexahydrate (NiCl 2·6H 2O), nickel nitrate hexahydrate (Ni(NO 3) 2·6H 2O), nickel hydroxide hexahydrate (Ni(OH) 2·6H 2O), nickel sulfate tetrahydrate (NiSO 4·4H 2O), on the thin films properties has been studied. In the experimental conditions used (substrate temperature 350 °C, precursor concentration 0.2-0.3 M, etc.), pure NiO thin films crystallized in the cubic phase can be achieved only with NiCl 2 and Ni(NO 3) 2 precursors. These films have been post-annealed at 425 °C for 3 h either in room atmosphere or under vacuum. If all the films are p-type, it is shown that the NiO films conductivity and optical transmittance depend on annealing process. The properties of the NiO thin films annealed under room atmosphere are not significantly modified, which is attributed to the fact that the temperature and the environment of this annealing is not very different from the experimental conditions during spray deposition. The annealing under vacuum is more efficient. This annealing being proceeded in a vacuum no better than 10 -2 Pa, it is supposed that the modifications of the NiO thin film properties, mainly the conductivity and optical transmission, are related to some interaction between residual oxygen and the films.

  18. Magnetic force microscopy of conducting nanodots in NiO thin films

    NASA Astrophysics Data System (ADS)

    Meang, Wan Joo; Seo, Jeongdae; Ahn, Yoonho; Son, J. Y.

    2016-03-01

    We report a nanoscale magnetic conducting filament in a resistive random access memory (RRAM) device by the direct investigation of conducting nanobits in NiO thin films using magnetic force microscopy. The conducting nanobit in a NiO RRAM capacitor formed by CAFM and KFM exhibited a typical bistable resistive switching characteristic. The magnetizations of the conducting nanobit were measured as a function of the set-reset switching cycle and as the switching cycles were increased, a strong ferromagnetic signal was observed. The metallic Ni formation in the nanoscale magnetic conducting filament could be a possible reason for the origin of the magnetism. [Figure not available: see fulltext.

  19. Geometric structures of thin film: Pt on Pd(110) and NiO on Ni(100)

    SciTech Connect

    Warren, O.L.

    1993-07-01

    This thesis is divided into 3 papers: dynamical low-energy electron- diffraction investigation of lateral displacements in topmost layer of Pd(110); determination of (1{times}1) and (1{times}2) structures of Pt thin films on Pd(110) by dynamical low-energy electron-diffraction analysis; and structural determination of a NiO(111) film on Ni(100) by dynamical low-energy electron-diffraction analysis.

  20. Probing the redox states at the surface of electroactive nanoporous NiO thin films.

    PubMed

    Marrani, Andrea G; Novelli, Vittoria; Sheehan, Stephen; Dowling, Denis P; Dini, Danilo

    2014-01-01

    Nanoporous NiO thin film electrodes were obtained via plasma-assisted microwave sintering and characterized by means of a combination of electrochemical techniques and X-ray photoelectron spectroscopy (XPS). The aim of this study is the elucidation of the nature of the surface changes introduced by the redox processes of this nanostructured material. NiO undergoes two distinct electrochemical processes of oxidation in aqueous electrolyte with the progress of NiO anodic polarization. These findings are consistent with the sequential formation of oxyhydroxide species at the surface, the chemical nature of which was assessed by XPS. Electronic relaxation effects in the Ni 2p spectra clearly indicated that the superficial oxyhydroxide species resulted to be β-NiOOH and γ-NiOOH. We also show for the first time spectral evidence of an electrochemically generated Ni(IV) species. This study has direct relevance for those applications in which NiO electrodes are utilized in aqueous electrolyte, namely catalytic water splitting or electrochromism, and may constitute a starting point for the comprehension of electronic phenomena at the NiO/organic electrolyte interface of cathodic dye-sensitized solar cells (p-DSCs). PMID:24325361

  1. Effect of different nickel precursors on capacitive behavior of electrodeposited NiO thin films

    NASA Astrophysics Data System (ADS)

    Kore, R. M.; Ghadge, T. S.; Ambare, R. C.; Lokhande, B. J.

    2016-04-01

    In the present study, the effect of nickel precursors containing different anions like nitrate, chloride and sulphate on the morphology and pseudocapacitance behavior of NiO is investigated. The NiO samples were prepared by using a potentiondynamic electrodeposition technique in the three electrode cell. Cyclic voltammetry technique was exploited for potentiodynamic deposition of the films. The obtained samples were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), etc. The XRD reveals the cubic crystal structure for all samples. The SEM micrograph shows nanoflakelike, up grown nanoflakes and honeycomb like nanostructured morphologies for nitrate, chloride and sulphate precursors respectively. The capacitive behavior of these samples was recorded using cyclic voltammetry (CV), charge-discharge and electrochemical impedance spectroscopy (EIS) in 1 M KOH electrolyte. The specific capacitance values of NiO samples obtained using CV for nitrate, chloride and sulphate precursors were 136, 214 and 893 Fg-1 respectively, at the scan rate of 5 mVs-1. The charge discharge study shows high specific energy for the sample obtained from sulphate (23.98 Whkg-1) as compared to chloride (9.67 Whkg-1) and nitrate (4.9 Whkg-1), whereas samples of cholride (13.9 kWkg-1 and nitrate (10.5 kWkg-1) shows comparatively more specific power than samples obtained from sulphate (7.6 kWkg-1). The equivalent series resistance of NiO samples observed from EIS study are 1.34, 1.29 and 1.27 Ω respectively for nitrate, chloride and sulphate precursors. These results emphasizes that the samples obtained from sulphate precursors provides very low impedance through honeycomb like nanostructured morphology which supports good capacitive behavior of NiO.

  2. Electronic and magnetic structure of epitaxial Fe3O4(001 ) /NiO heterostructures grown on MgO(001) and Nb-doped SrTiO3(001 )

    NASA Astrophysics Data System (ADS)

    Kuepper, K.; Kuschel, O.; Pathé, N.; Schemme, T.; Schmalhorst, J.; Thomas, A.; Arenholz, E.; Gorgoi, M.; Ovsyannikov, R.; Bartkowski, S.; Reiss, G.; Wollschläger, J.

    2016-07-01

    We study the underlying chemical, electronic, and magnetic properties of a number of magnetite-based thin films. The main focus is placed onto Fe3O4 (001)/NiO bilayers grown on MgO(001) and Nb-SrTiO3(001) substrates. We compare the results with those obtained on pure Fe3O4 (001) thin films. It is found that the magnetite layers are oxidized and Fe3 + dominates at the surfaces due to maghemite (γ -Fe2O3 ) formation, which decreases with increasing magnetite layer thickness. For layer thicknesses of around 20 nm and above, the cationic distribution is close to that of stoichiometric Fe3O4 . At the interface between NiO and Fe3O4 we find the Ni to be in a divalent valence state, with unambiguous spectral features in the Ni 2 p core level x-ray photoelectron spectra typical for NiO. The formation of a significant NiFe2O4 interlayer can be excluded by means of x-ray magnetic circular dichroism. Magneto-optical Kerr effect measurements reveal significant higher coercive fields compared to magnetite thin films grown on MgO(001), and an altered in-plane easy axis pointing in the <100 > direction. We discuss the spin magnetic moments of the magnetite layers and find that a thickness of 20 nm or above leads to spin magnetic moments close to that of bulk magnetite.

  3. Origin of intrinsic ferromagnetism in undoped antiferromagnetic NiO thin films

    NASA Astrophysics Data System (ADS)

    Verma, Vikram; Katiyar, Monica

    2015-06-01

    Thin films of nickel oxide (NiO) have been deposited on Si substrates using pulsed laser deposition technique. The number of laser pulses and substrate temperature were changed to vary the average particle size of different samples. The x-ray data show that all films are polycrystalline irrespective of deposition condition and the preferred texture of the thin film changes with temperature. A detailed magnetic characterization of the M-H loops at different temperatures as well as zero-field-cooled and field-cooled (ZFC-FC) curves has been carried out to show that NiO films having a particle size of 3.6 nm and 5.9 nm exhibit the transition from superparamagnetic to ferromagnetic as we decrease the temperature. Whereas for films having a larger average particle size (30.3 nm), the behavior is antiferromagnetic (AFM) at all temperatures similar to the bulk NiO. The exchange bias proves the presence of ferromagnetic contribution in addition to the AFM part in films having a small crystallite size. The linear correlation between susceptibility and the inverse of the particle diameter confirmed that our samples follow Neel’s case for random distribution of uncompensated spins at the crystallite surface. To further verify this model, the value of the surface anisotropy constant is calculated and found to be in agreement with the reported values.

  4. Electromigration effect of Ni electrodes on the resistive switching characteristics of NiO thin films

    NASA Astrophysics Data System (ADS)

    Lee, C. B.; Kang, B. S.; Lee, M. J.; Ahn, S. E.; Stefanovich, G.; Xianyu, W. X.; Kim, K. H.; Hur, J. H.; Yin, H. X.; Park, Y.; Yoo, I. K.; Park, J.-B.; Park, B. H.

    2007-08-01

    The effects of Ni and Ni0.83Pt0.17 alloy electrodes on the resistance switching of the dc-sputtered polycrystalline NiO thin films were investigated. The initial off-state resistances of the films were similar to that of Pt /NiO/Pt film. However, after the first cycle of switching, the off-state resistance significantly decreased in the films with Ni in the electrode. It can be attributed to the migration of Ni from electrodes to the NiO films. The improvement in data dispersion of switching parameters is explained in terms of the decrease of the effective thickness of the films resulting from the migration of Ni.

  5. Structure, optical and electrochromic properties of NiO thin films

    NASA Astrophysics Data System (ADS)

    Sawaby, A.; Selim, M. S.; Marzouk, S. Y.; Mostafa, M. A.; Hosny, A.

    2010-08-01

    Nickel oxide thin films were prepared by sol-gel dip coating process. Nickel acetate tetrahydrate [Ni(CH 3COO) 2·4H 2O] has been used as the starting material with absolute ethyl alcohol to prepare NiO thin films on both glass and indium tin oxide glass (ITO) substrates with heat treatment at different annealing temperatures from 673 to 733 K. Thermogravimetric analysis (TGA) was studied for the xerogel sample. Polycrystalline structures of the prepared films were detected by X-ray diffraction analysis (XRD), and the particle size was determined by Scherrer formula. The morphology and the structure of the prepared thin films were investigated by the transmission electron microscope (TEM). The optical properties of NiO thin films were examined. The optical constants such as the absorption coefficient ( α), extinction coefficient ( k), the energy gap ( Eg) and the refractive index ( n) of the prepared films were determined. The effect of annealing temperature on the electrochromic behavior was observed providing that good electrochromic performance was T<713 K.

  6. Facile Route to NiO Nanostructured Electrode Grown by Oblique Angle Deposition Technique for Supercapacitors.

    PubMed

    Kannan, Vasudevan; Inamdar, Akbar I; Pawar, Sambaji M; Kim, Hyun-Seok; Park, Hyun-Chang; Kim, Hyungsang; Im, Hyunsik; Chae, Yeon Sik

    2016-07-13

    We report an efficient method for growing NiO nanostructures by oblique angle deposition (OAD) technique in an e-beam evaporator for supercapacitor applications. This facile physical vapor deposition technique combined with OAD presents a unique, direct, and economical route for obtaining high width-to-height ratio nanorods for supercapacitor electrodes. The NiO nanostructure essentially consists of nanorods with varying dimensions. The sample deposited at OAD 75° showed highest supercapacitance value of 344 F/g. NiO nanorod electrodes exhibits excellent electrochemical stability with no degradation in capacitance after 5000 charge-discharge cycles. The nanostructured film adhered well to the substrate and had 131% capacity retention. Peak energy density and power density of the NiO nanorods were 8.78 Wh/kg and 2.5 kW/kg, respectively. This technique has potential to be expanded for growing nanostructured films of other interesting metal/metal oxide candidates for supercapacitor applications. PMID:27322601

  7. Memory and threshold resistive switching in BiFeO3 thin films using NiO as a buffer layer

    NASA Astrophysics Data System (ADS)

    Luo, Jinming; Zhang, Haining; Chen, Shuhan; Yang, Xiaodong; Bu, Shouliang; Wen, Jianping

    2016-05-01

    BiFeO3 and BiFeO3/NiO thin films have been deposited on Pt/Ti/SiO2/Si substrates by sol-gel method. Compared with bare BiFeO3 thin films, an improvement of memory resistive switching characteristic, such as the dispersion of switching voltages and resistances, has been clearly observed in BiFeO3 thin films using NiO as a buffer layer. Moreover, threshold resistive switching has also been demonstrated in BiFeO3/NiO thin films, but no observation in BiFeO3 thin films. Then, the role of thin NiO layer on memory resistive switching stabilization and threshold resistive switching is discussed.

  8. Structural, optical and electrochromic properties of nickel oxide thin films grown from electrodeposited nickel sulphide

    NASA Astrophysics Data System (ADS)

    Uplane, M. M.; Mujawar, S. H.; Inamdar, A. I.; Shinde, P. S.; Sonavane, A. C.; Patil, P. S.

    2007-10-01

    Nickel oxide thin films were grown onto FTO-coated glass substrates by a two-step process: electrodeposition of nickel sulphide and their thermal oxidation at 425, 475 and 525 °C. The influence of thermal oxidation temperature on structural, optical, morphological and electrochromic properties was studied. The structural properties undoubtedly revealed NiO formation. The electrochromic properties were studied by means of cyclic voltammetry. The films exhibited anodic electrochromism, changing from a transparent state to a coloured state at +0.75 V versus SCE, i.e. by simultaneous ion and electron ejection. The transmittance in the coloured and bleached states was recorded to access electrochromic quality of the films. Colouration efficiency and electrochromic reversibility were found to be maximum (21 mC/cm 2 and 89%, respectively) for the films oxidized at 425 °C. The optical band gap energy of nickel oxide slightly varies with increase in annealing temperature.

  9. Realization of a label-free electrochemical immunosensor for detection of low density lipoprotein using NiO thin film.

    PubMed

    Kaur, Gurpreet; Tomar, Monika; Gupta, Vinay

    2016-06-15

    A label-free electrochemical immunosensor, based on nickel oxide (NiO) thin film, for the detection of low density lipoprotein (LDL) has been proposed. P-type semiconducting NiO thin film was deposited by RF sputtering technique and its properties were investigated by X-ray diffraction and Fourier transform infrared spectroscopy. The NiO thin film was utilized as an efficient matrix for the covalent immobilization of apolipoprotein B-100 antibody using EDC/NHS chemistry. The immunoelectrode, thus prepared, was studied using differential pulse voltammetry, cyclic voltammetry and electrochemical impedance spectroscopy. The impedimetric response of the immunosensor exhibited a high sensitivity of 12 kΩ μM(-1) over a wide linear range (0.018-0.5 μM) of LDL. The long shelf life (18 weeks) and enhanced performance characteristics of the immunosensor demonstrate the excellent ability of the NiO matrix for quantification of LDL at commercial level. PMID:26852197

  10. Fabrication of NiO thin film electrode for supercapacitor applications

    SciTech Connect

    Mali, V. V.; Navale, S. T.; Chougule, M. A.; Khuspe, G. D.; Godse, P. R.; Patil, V. B.; Pawar, S. A.

    2014-04-24

    Nanocrystalline NiO electrode is successfully electrosynthesized for supercapacitor application. The nanocrystalline NiO electrode is characterized using scanning electron microscope (SEM). Nickel oxide is a highly porous and the film surface looked smooth and composed of fine elongated particles. The supercapacitive performance of NiO electrode is tested using cyclic voltammetry (C-V) technique in 0.5M Na{sub 2}S{sub 2}O{sub 3} electrolyte within potential range of −1.2 to +1.2 V. The effect of scan rate on the capacitance of NiO electrode is studied. The highest specific capacitance of 439 Fg{sup −1} at the voltage scan rate of 50mVs{sup −1} is achieved. Additionally stability and charging–discharging of NiO electrode are studied.

  11. Electrical properties of undoped and Li-doped NiO thin films deposited by RF sputtering without intentional heating

    NASA Astrophysics Data System (ADS)

    Sugiyama, Mutsumi; Nakai, Hiroshi; Sugimoto, Gaku; Yamada, Aika; Chichibu, Shigefusa F.

    2016-08-01

    The fundamental transmittance and electrical properties of undoped and Li-doped NiO thin films deposited by conventional RF sputtering without intentional heating were evaluated. Both the transmittance and resistivity of undoped and Li-doped NiO decreased with increasing O2 fraction in the sputtering gas, f(O2) = O2/(Ar + O2). The result is attributed to the increase in the concentration of acceptors of Ni vacancies (VNi) under oxygen-rich growth conditions. In addition to VNi, Li atom on the Ni site (LiNi) likely acts as a shallow accepter, which can explain the experimental finding that the carrier concentration of Li-doped NiO was approximately three orders of magnitude higher than that of the undoped case deposited under the same f(O2). The mobility of NiO was remarkably low (around 0.1–1.0 cm2 V‑1 s‑1) and almost independent of f(O2) or the amount of doping, reflecting the large hole effective mass.

  12. thin films grown with additional NaF layers

    NASA Astrophysics Data System (ADS)

    Kim, Gee Yeong; Kim, Juran; Jo, William; Son, Dae-Ho; Kim, Dae-Hwan; Kang, Jin-Kyu

    2014-10-01

    CZTS precursors [SLG/Mo (300 nm)/ZnS (460 nm)/SnS (480 nm)/Cu (240 nm)] were deposited by RF/DC sputtering, and then NaF layers (0, 15, and 30 nm) were grown by electron beam evaporation. The precursors were annealed in a furnace with Se metals at 590°C for 20 minutes. The final composition of the CZTSSe thin-films was of Cu/(Zn + Sn) ~ 0.88 and Zn/Sn ~ 1.05, with a metal S/Se ratio estimated at ~0.05. The CZTSSe thin-films have different NaF layer thicknesses in the range from 0 to 30 nm, achieving a ~3% conversion efficiency, and the CZTSSe thin-films contain ~3% of Na. Kelvin probe force microscopy was used to identify the local potential difference that varied according to the thickness of the NaF layer on the CZTSSe thin-films. The potential values at the grain boundaries were observed to increase as the NaF thickness increased. Moreover, the ratio of the positively charged GBs in the CZTSSe thin-films with an NaF layer was higher than that of pure CZTSSe thin-films. A positively charged potential was observed around the grain boundaries of the CZTSSe thin-films, which is a beneficial characteristic that can improve the performance of a device.

  13. Fabrication of hetero-junction diode using NiO thin film on ITO/glass substrate

    NASA Astrophysics Data System (ADS)

    Soni, Sonali; Sharma, Vinay; Kuanr, Bijoy K.

    2016-05-01

    Fabrication, characterization and testing of hetero-junctions of NiO thin films were done. Nickel films were evaporated on polished ITO coated glass substrates using thermal deposition. The films were annealed at high temperatures in the presence of oxygen to obtain NiO films. The rectifying current-voltage (I-V) properties confirmed that a hetero-junction diode was successfully formed. The AC and DC behavior of hetero-junction using DC silver-probes were determined. The threshold voltage, ideality factor and reverse saturation current of hetero junction were determined. We have compared these I-V characteristics with semiconducting PN junction diode. To test the device characteristics, we used the structure as a diode clipper at various frequencies. It is showed that our device is a better high-frequency junction-device than a normal PN junction diode.

  14. InSb thin films grown by electrodeposition

    SciTech Connect

    Singh, Joginder Rajaram, P.

    2014-04-24

    We have grown InSb thin films on Cu substrates using the electrodeposition technique. The electrochemical bath from which the InSb thin films were grown was made up of a mixture of aqueous solutions of 0.05 M InCl{sub 3} and 0.03M SbCl{sub 3}, 0 .20M citric acid and 0.30M sodium citrate. Citric acid and sodium citrate were used as complexing agents to bring the reduction potential of In and Sb closer to maintain binary growth. The electrodeposited films were characterized by structural, morphological and optical studies. X-ray diffraction studies show that the films are polycrystalline InSb having the zinc blende structure. Scanning electron microscopy (SEM) studies reveal that the surface of the films is uniformly covered with submicron sized spherical particles. FTIR spectra of InSb thin films show a sharp absorption peak at wave number 1022 cm{sup −1} corresponding to the band gap. Hot probe analysis shows that the InSb thin films have p type conductivity.

  15. InSb thin films grown by electrodeposition

    NASA Astrophysics Data System (ADS)

    Singh, Joginder; Rajaram, P.

    2014-04-01

    We have grown InSb thin films on Cu substrates using the electrodeposition technique. The electrochemical bath from which the InSb thin films were grown was made up of a mixture of aqueous solutions of 0.05 M InCl3 and 0.03M SbCl3, 0 .20M citric acid and 0.30M sodium citrate. Citric acid and sodium citrate were used as complexing agents to bring the reduction potential of In and Sb closer to maintain binary growth. The electrodeposited films were characterized by structural, morphological and optical studies. X-ray diffraction studies show that the films are polycrystalline InSb having the zinc blende structure. Scanning electron microscopy (SEM) studies reveal that the surface of the films is uniformly covered with submicron sized spherical particles. FTIR spectra of InSb thin films show a sharp absorption peak at wave number 1022 cm-1 corresponding to the band gap. Hot probe analysis shows that the InSb thin films have p type conductivity.

  16. Tuning the metal-insulator transition temperature of Sm0.5Nd0.5NiO3 thin films via strain

    NASA Astrophysics Data System (ADS)

    Gardner, H. Jeffrey; Singh, Vijay; Zhang, Le; Hong, Xia

    2014-03-01

    We have investigated the effect of substrate induced strain and film thickness on the metal-insulator transition of the correlated oxide Sm0.5Nd0.5NiO3 (SNNO). We have fabricated epitaxial 3 - 40 nm thick SNNO films on (001) LaAlO3 (LAO), (001) SrTiO3 (STO), and (110) NdGaO3 (NGO) via off-axis RF magnetron sputtering. The SNNO films are atomically smooth with (001) orientation as determined by atomic force microscopy and x-ray diffraction. SNNO films grown on LAO, subject to compressive strain, exhibit a sharp metal-insulator transition at lower temperatures. Conversely, films grown on STO and NGO, subject to tensile strain, exhibit a smeared albeit above room temperature metal-insulator transition. For all substrates, we have observed that the metal-insulator transition temperature (TMI) increases monotonically with decreasing film thickness until the electrically dead layer is reached (below 4 nm). We discuss the effect of strain and oxygen deficiencies on the TMI of SNNO thin films.

  17. Metastable oxygen incorporation into thin film NiO by low temperature active oxidation: Influence on hole conduction

    SciTech Connect

    Aydogdu, Gulgun H.; Ruzmetov, Dmitry; Ramanathan, Shriram

    2010-12-01

    The ability to controllably tune cation valence state and resulting electrical conductivity of transition metal-oxides such as NiO is of great interest for a range of solid state electronic and energy devices and more recently in understanding electron correlation phenomena at complex oxide interfaces. Here, we demonstrate that it is possible to enhance electrical conductivity of NiO thin films by one order of magnitude by photoexcitation and three orders of magnitude by ozone treatment at as low as 310 K. The change occurs within nearly 2000 s and, thereafter, reaches a self-limiting value. A surprising difference is seen at 400 K: ultraviolet photon and ozone treatments cause only a marginal reduction in resistance in the first few minutes and, then, the resistance begins to increase and recovers its original value. This unusual reversal is explained by considering metastable incorporation of oxygen in NiO and oxygen equilibration with the environment. Variation in nickel valence state prior to and after photoexcitation and ozone treatment, investigated by x-ray photoelectron spectroscopy, provides mechanistic insights into resistance trends. This study demonstrates photon-assisted and ozone oxidation as effective low temperature routes to tune the electrical properties as well as metastably incorporate oxygen into oxides with direct influence on electrical conduction properties.

  18. Influence of oxygen partial pressure on the physical properties of Ag doped NiO thin films

    NASA Astrophysics Data System (ADS)

    Reddy, Y. Ashok Kumar; Reddy, A. Sivasankar; Reddy, P. Sreedhara

    2013-06-01

    Ag doped p-type NiO thin films were successfully deposited by DC reactive magnetron sputtering technique at different oxygen partial pressures in the range 1 × 10-4 - 9 × 10-4 mbar. The structural and morphological properties of the films were characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM). All the deposited films were of polycrystalline nature and exhibited cubic structure with preferential growth. The morphological studies revealed that the surface roughness was increased with increasing oxygen partial pressure up to 5 × 10-4 mbar and decreased at higher oxygen partial pressures.

  19. Characterization of graphene grown on bulk and thin film nickel.

    PubMed

    Lu, Chun-Chieh; Jin, Chuanhong; Lin, Yung-Chang; Huang, Chi-Ruei; Suenaga, Kazu; Chiu, Po-Wen

    2011-11-15

    We report on graphene films grown by atmospheric pressure chemical vapor deposition on bulk and thin film nickel. Carbon precipitation on the polycrystalline grains is controlled by the methane concentration and substrate cooling rate. It is found that graphene grows over multiple grains, with edges terminating along the grain boundaries and with dimensions directly correlated to the size of the underlying grains. This greatly restricts the resulting graphene size (<10 μm) in the thin film growth, whereas monolayer graphene with linear dimensions of hundreds of micrometers takes up the great majority of the surface overlayers on the bulk nickel (>50%). In addition, the number of layers can be better controlled in the bulk growth. Characterizations of the graphene sheets using transmission electron microscopy, Raman spectroscopy, and transport measurements in the field-effect configuration are also discussed. PMID:21967558

  20. NiO nanosheets grown on graphene nanosheets as superior anode materials for Li-ion batteries

    NASA Astrophysics Data System (ADS)

    Zou, Yuqin; Wang, Yong

    2011-06-01

    This paper reports a hydrothermal preparation of NiO-graphene sheet-on-sheet and nanoparticle-on-sheet nanostructures. The sheet-on-sheet nanocomposite showed highly reversible large capacities at a common current of 0.1 C and good rate capabilities. A large initial charge capacity of 1056 mAh/g was observed for the sheet-on-sheet composite at 0.1 C, which decreased by only 2.4% to 1031 mAh/g after 40 cycles of discharge and charge. This cycling performance is better than that of NiO nanosheets, graphene nanosheets, NiO-graphene nanoparticle-on-sheet, and previous carbon/carbon nanotube supported NiO composites. It is believed that the mechanical stability and electrical conductivity of NiO nanosheets are increased by graphene nanosheets (GNS), the aggregation or restacking of which to graphite platelets are, on the other hand, effectively prevented by NiO nanosheets.

  1. An ultra-thin, un-doped NiO hole transporting layer of highly efficient (16.4%) organic-inorganic hybrid perovskite solar cells

    NASA Astrophysics Data System (ADS)

    Seo, Seongrok; Park, Ik Jae; Kim, Myungjun; Lee, Seonhee; Bae, Changdeuck; Jung, Hyun Suk; Park, Nam-Gyu; Kim, Jin Young; Shin, Hyunjung

    2016-06-01

    NiO is a wide band gap p-type oxide semiconductor and has potential for applications in solar energy conversion as a hole-transporting layer (HTL). It also has good optical transparency and high chemical stability, and the capability of aligning the band edges to the perovskite (CH3NH3PbI3) layers. Ultra-thin and un-doped NiO films with much less absorption loss were prepared by atomic layer deposition (ALD) with highly precise control over thickness without any pinholes. Thin enough (5-7.5 nm in thickness) NiO films with the thickness of few time the Debye length (LD = 1-2 nm for NiO) show enough conductivities achieved by overlapping space charge regions. The inverted planar perovskite solar cells with NiO films as HTLs exhibited the highest energy conversion efficiency of 16.40% with high open circuit voltage (1.04 V) and fill factor (0.72) with negligible current-voltage hysteresis.NiO is a wide band gap p-type oxide semiconductor and has potential for applications in solar energy conversion as a hole-transporting layer (HTL). It also has good optical transparency and high chemical stability, and the capability of aligning the band edges to the perovskite (CH3NH3PbI3) layers. Ultra-thin and un-doped NiO films with much less absorption loss were prepared by atomic layer deposition (ALD) with highly precise control over thickness without any pinholes. Thin enough (5-7.5 nm in thickness) NiO films with the thickness of few time the Debye length (LD = 1-2 nm for NiO) show enough conductivities achieved by overlapping space charge regions. The inverted planar perovskite solar cells with NiO films as HTLs exhibited the highest energy conversion efficiency of 16.40% with high open circuit voltage (1.04 V) and fill factor (0.72) with negligible current-voltage hysteresis. Electronic supplementary information (ESI) available. See DOI: 10.1039/c6nr01601d

  2. An ultra-thin, un-doped NiO hole transporting layer of highly efficient (16.4%) organic-inorganic hybrid perovskite solar cells.

    PubMed

    Seo, Seongrok; Park, Ik Jae; Kim, Myungjun; Lee, Seonhee; Bae, Changdeuck; Jung, Hyun Suk; Park, Nam-Gyu; Kim, Jin Young; Shin, Hyunjung

    2016-06-01

    NiO is a wide band gap p-type oxide semiconductor and has potential for applications in solar energy conversion as a hole-transporting layer (HTL). It also has good optical transparency and high chemical stability, and the capability of aligning the band edges to the perovskite (CH3NH3PbI3) layers. Ultra-thin and un-doped NiO films with much less absorption loss were prepared by atomic layer deposition (ALD) with highly precise control over thickness without any pinholes. Thin enough (5-7.5 nm in thickness) NiO films with the thickness of few time the Debye length (LD = 1-2 nm for NiO) show enough conductivities achieved by overlapping space charge regions. The inverted planar perovskite solar cells with NiO films as HTLs exhibited the highest energy conversion efficiency of 16.40% with high open circuit voltage (1.04 V) and fill factor (0.72) with negligible current-voltage hysteresis. PMID:27216291

  3. Effects of anode materials on resistive characteristics of NiO thin films

    SciTech Connect

    Jia, Ze; Wang, Linkai; Zhang, Naiwen; Ren, Tianling; Liou, Juin J.

    2013-01-28

    This letter shows that the NiO-based structure with different anodes has different resistive switching properties. A conical conductive filament (CF) model is proposed for oxygen vacancies distributed in NiO films. Modeling analysis reveals much larger dissolution velocity of CF near anodes than near cathodes during the reset process. Different interfaces shown in Auger electron spectroscopy can be bound with the model to reveal that CF is dissolved in the structure with Pt or Au as anodes, while CF remains constant if the anode material is Ti or Al, which can explain whether switching properties occur in the specific NiO-based structures.

  4. Layer matching epitaxy of NiO thin films on atomically stepped sapphire (0001) substrates

    PubMed Central

    Yamauchi, Ryosuke; Hamasaki, Yosuke; Shibuya, Takuto; Saito, Akira; Tsuchimine, Nobuo; Koyama, Koji; Matsuda, Akifumi; Yoshimoto, Mamoru

    2015-01-01

    Thin-film epitaxy is critical for investigating the original properties of materials. To obtain epitaxial films, careful consideration of the external conditions, i.e. single-crystal substrate, temperature, deposition pressure and fabrication method, is significantly important. In particular, selection of the single-crystal substrate is the first step towards fabrication of a high-quality film. Sapphire (single-crystalline α-Al2O3) is commonly used in industry as a thin-film crystal-growth substrate, and functional thin-film materials deposited on sapphire substrates have found industrial applications. However, while sapphire is a single crystal, two types of atomic planes exist in accordance with step height. Here we discuss the need to consider the lattice mismatch for each of the sapphire atomic layers. Furthermore, through cross-sectional transmission electron microscopy analysis, we demonstrate the uniepitaxial growth of cubic crystalline thin films on bistepped sapphire (0001) substrates. PMID:26402241

  5. Multiferroic YCrO3 thin films grown on glass substrate: Resistive switching characteristics

    NASA Astrophysics Data System (ADS)

    Seo, Jeongdae; Ahn, Yoonho; Son, Jong Yeog

    2016-01-01

    Polycrystalline YCrO3 thin films were deposited on (111) Pt/Ta/glass substrates by pulsed laser deposition. The YCrO3 thin films exhibited good ferroelectric properties with remnant polarization of about 5 µC/cm2. Large leakage current was observed by I- V curve and ferroelectric hysteresis loop. The YCrO3 resistive random access memory (RRAM) capacitor showed unipolar switching behaviors with SET and RESET voltages higher than those of general NiO RRAM capacitors. [Figure not available: see fulltext.

  6. Optical constants and dispersion energy parameters of NiO thin films prepared by radio frequency magnetron sputtering technique

    NASA Astrophysics Data System (ADS)

    Usha, K. S.; Sivakumar, R.; Sanjeeviraja, C.

    2013-09-01

    In this paper, we report on rf power induced change in the structural and optical properties of nickel oxide (NiO) thin films deposited onto glass substrates by rf magnetron sputtering technique. The crystallinity of the film was found to increase with increasing rf power and the deposited film belong to cubic phase. The maximum optical transmittance of 95% was observed for the film deposited at 100 W. The slight shift in transmission threshold towards higher wavelength region with increasing rf power revealed the systematic reduction in optical energy band gap (3.93 to 3.12 eV) of the films. The dispersion curve of the refractive index shows an anomalous dispersion in the absorption region and a normal dispersion in the transparent region. It was observed that the dispersion data obeyed the single oscillator of the Wemple-Didomenico model, from which the dispersion parameters, dielectric constants, relaxation time, and optical non-linear susceptibility were evaluated. We have made an attempt to discuss and correlate these results with the light of possible mechanisms underlying the phenomena.

  7. Metal-insulator transition at room temperature and infrared properties of Nd0.7Eu0.3NiO3 thin films

    NASA Astrophysics Data System (ADS)

    Capon, F.; Laffez, P.; Bardeau, J.-F.; Simon, P.; Lacorre, P.; Zaghrioui, M.

    2002-07-01

    Nd0.7Eu0.3NiO3 thin films are deposited by rf sputtering and subsequent oxygen pressure annealing on (100) oriented silicon substrate. We characterize the thermochromic properties of films by measuring electrical transition, infrared transmittance, and reflectance. The thermochromic effect at room temperature is observed. Resistivity measurements exhibit a sharper hysteresis loop than is usually observed in NdNiO3 thin films. Infrared properties in the 8-14 mum wavelength range spectra reveal a contrast of 30% in reflectance and 55% in transmittance.

  8. Structural and morphological properties of sputtered NiO thin films at various sputtering pressures

    SciTech Connect

    Reddy, A. Mallikarjuna; Reddy, Y. Ashok Kumar; Reddy, A. Sivasankar; Reddy, P. Sreedhara

    2012-06-05

    Nickel oxide thin films were successfully deposited on glass substrates at different sputtering pressures in the range of 3 x 10{sup -2} to 5 x 10{sup -2} mbar. It was observed that sputtering pressure influenced the structural and morphological properties. Structural properties were studied with X-ray diffractometer. All the deposited films were polycrystalline and exhibited cubic structure with preferential growth along (220) plane. From morphological studies it was observed that fine and uniform grains with RMS roughness of 9.4 nm were obtained when the films deposited at a sputtering pressure of 4 x 10{sup -2} mbar,. The grain size and the surface roughness decreased at higher sputtering pressures. The surface mobility of the adatoms decreased after series of collisions resulting in the decrease of grain size at high sputtering pressures.

  9. Photoluminescence Spectra of thin Zno films grown by ALD technology

    NASA Astrophysics Data System (ADS)

    Akopyan, I. Kh.; Davydov, V. Yu.; Labzovskaya, M. E.; Lisachenko, A. A.; Mogunov, Ya. A.; Nazarov, D. V.; Novikov, B. V.; Romanychev, A. I.; Serov, A. Yu.; Smirnov, A. N.; Titov, V. V.; Filosofov, N. G.

    2015-09-01

    The photoluminescence of ZnO films grown by atomic layer deposition (ALD) on silicon substrates has been investigated. A new broad photoluminescence band has been revealed in the exciton region of the spectrum. The properties of the band in the spectra of the films with different crystallographic orientations of substrates have been studied in a wide temperature range at different excitation levels. A model describing the origin of the new band has been proposed.

  10. Effect of NiO spin orientation on the magnetic anisotropy of the Fe film in epitaxially grown Fe/NiO/Ag(001) and Fe/NiO/MgO(001)

    SciTech Connect

    Kim, W.; Jin, E.; Wu, J.; Park, J.; Arenholz, E.; Scholl, A.; Hwang, C.; Qiu, Z.

    2010-02-10

    Single crystalline Fe/NiO bilayers were epitaxially grown on Ag(001) and on MgO(001), and investigated by Low Energy Electron Diffraction (LEED), Magneto-Optic Kerr Effect (MOKE), and X-ray Magnetic Linear Dichroism (XMLD). We find that while the Fe film has an in-plane magnetization in both Fe/NiO/Ag(001) and Fe/NiO/MgO(001) systems, the NiO spin orientation changes from in-plane direction in Fe/NiO/Ag(001) to out-of-plane direction in Fe/NiO/MgO(001). These two different NiO spin orientations generate remarkable different effects that the NiO induced magnetic anisotropy in the Fe film is much greater in Fe/NiO/Ag(001) than in Fe/NiO/MgO(001). XMLD measurement shows that the much greater magnetic anisotropy in Fe/NiO/Ag(001) is due to a 90{sup o}-coupling between the in-plane NiO spins and the in-plane Fe spins.

  11. Some studies on successive ionic layer adsorption and reaction (SILAR) grown indium sulphide thin films

    SciTech Connect

    Pathan, H.M.; Lokhande, C.D. . E-mail: l_chandrakant@yahoo.com; Kulkarni, S.S.; Amalnerkar, D.P.; Seth, T.; Han, Sung-Hwan . E-mail: shhan@hanyang.ac.kr

    2005-06-15

    Indium sulphide (In{sub 2}S{sub 3}) thin films were grown on amorphous glass substrate by the successive ionic layer adsorption and reaction (SILAR) method. X-ray diffraction, optical absorption, scanning electron microscopy (SEM) and Rutherford back scattering (RBS) were applied to study the structural, optical, surface morphological and compositional properties of the indium sulphide thin films. Utilization of triethanolamine and hydrazine hydrate complexed indium sulphate and sodium sulphide as precursors resulted in nanocrystalline In{sub 2}S{sub 3} thin film. The optical band gap was found to be 2.7 eV. The film appeared to be smooth and homogeneous from SEM study.

  12. Significance of microstructure for a MOCVD-grown YSZ thin film gas sensor

    SciTech Connect

    Vetrone, J.; Foster, C.; Bai, G.

    1996-11-01

    The authors report the fabrication and characterization of a low temperature (200--400 C) thin film gas sensor constructed from a MOCVD-grown yttria-stabilized zirconia (YSZ) layer sandwiched between two platinum thin film electrodes. A reproducible gas-sensing response is produced by applying a cyclic voltage which generates voltammograms with gas-specific current peaks and shapes. Growth conditions are optimized for preparing YSZ films having dense microstructures, low leakage currents, and maximum ion conductivities. In particular, the effect of growth temperature on film morphology and texture is discussed and related to the electrical and gas-sensing properties of the thin film sensor device.

  13. Study of high [Tc] superconducting thin films grown by MOCVD

    SciTech Connect

    Erbil, A.

    1990-01-01

    Work is described briefly, which was carried out on development of techniques to grow metal-semiconductor superlattices (artificially layered materials) and on the copper oxide based susperconductors (naturally layered materials). The current growth technique utilized is metalorganic chemical vapor deposition (MOCVD). CdTe, PbTe, La, LaTe, and Bi[sub 2]Te[sub 3] were deposited, mostly on GaAs. Several YBa[sub 2]Cu[sub 3]O[sub 7] compounds were obtained with possible superconductivity at temperatures up to 550 K (1 part in 10[sup 4]). YBa[sub 2]Cu[sub 3]O[sub 7[minus]x] and Tl[sub 2]CaBa[sub 2]Cu[sub 2]O[sub y] thin films were deposited by MOCVD on common substrates such as glass.

  14. Thin film transistors using PECVD-grown carbon nanotubes.

    PubMed

    Ono, Yuki; Kishimoto, Shigeru; Ohno, Yutaka; Mizutani, Takashi

    2010-05-21

    Thin film transistors with a carbon nanotube (CNT) network as a channel have been fabricated using grid-inserted plasma-enhanced chemical vapor deposition (PECVD) which has the advantage of preferential growth of the CNTs with semiconducting behavior in the I-V characteristics of CNT field effect transistors (CNT-FETs). Taking advantage of the preferential growth and suppression of bundle formation, a large ON current of 170 microA mm(-1), which is among the largest in these kinds of devices with a large ON/OFF current ratio of about 10(5), has been realized in the relatively short channel length of 10 microm. The field effect mobility of the device was 5.8 cm(2) V(-1) s(-1). PMID:20418603

  15. Thin film transistors using PECVD-grown carbon nanotubes

    NASA Astrophysics Data System (ADS)

    Ono, Yuki; Kishimoto, Shigeru; Ohno, Yutaka; Mizutani, Takashi

    2010-05-01

    Thin film transistors with a carbon nanotube (CNT) network as a channel have been fabricated using grid-inserted plasma-enhanced chemical vapor deposition (PECVD) which has the advantage of preferential growth of the CNTs with semiconducting behavior in the I-V characteristics of CNT field effect transistors (CNT-FETs). Taking advantage of the preferential growth and suppression of bundle formation, a large ON current of 170 µA mm - 1, which is among the largest in these kinds of devices with a large ON/OFF current ratio of about 105, has been realized in the relatively short channel length of 10 µm. The field effect mobility of the device was 5.8 cm2 V - 1 s - 1.

  16. Epitaxially grown strained pentacene thin film on graphene membrane.

    PubMed

    Kim, Kwanpyo; Santos, Elton J G; Lee, Tae Hoon; Nishi, Yoshio; Bao, Zhenan

    2015-05-01

    Organic-graphene system has emerged as a new platform for various applications such as flexible organic photovoltaics and organic light emitting diodes. Due to its important implication in charge transport, the study and reliable control of molecular packing structures at the graphene-molecule interface are of great importance for successful incorporation of graphene in related organic devices. Here, an ideal membrane of suspended graphene as a molecular assembly template is utilized to investigate thin-film epitaxial behaviors. Using transmission electron microscopy, two distinct molecular packing structures of pentacene on graphene are found. One observed packing structure is similar to the well-known bulk-phase, which adapts a face-on molecular orientation on graphene substrate. On the other hand, a rare polymorph of pentacene crystal, which shows significant strain along the c-axis, is identified. In particular, the strained film exhibits a specific molecular orientation and a strong azimuthal correlation with underlying graphene. Through ab initio electronic structure calculations, including van der Waals interactions, the unusual polymorph is attributed to the strong graphene-pentacene interaction. The observed strained organic film growth on graphene demonstrates the possibility to tune molecular packing via graphene-molecule interactions. PMID:25565340

  17. EXAFS and XANES investigation of (Li, Ni) codoped ZnO thin films grown by pulsed laser deposition.

    PubMed

    Mino, Lorenzo; Gianolio, Diego; Bardelli, Fabrizio; Prestipino, Carmelo; Senthil Kumar, E; Bellarmine, F; Ramanjaneyulu, M; Lamberti, Carlo; Ramachandra Rao, M S

    2013-09-25

    Ni doped, Li doped and (Li, Ni) codoped ZnO thin films were successfully grown using a pulsed laser deposition technique. Undoped and doped ZnO thin films were investigated using extended x-ray absorption fine structure (EXAFS) and x-ray absorption near edge spectroscopy (XANES). Preliminary investigations on the Zn K-edge of the undoped and doped ZnO thin films revealed that doping has not influenced the average Zn-Zn bond length and Debye-Waller factor. This shows that both Ni and Li doping do not appreciably affect the average local environment of Zn. All the doped ZnO thin films exhibited more than 50% of substitutional Ni, with a maximum of 77% for 2% Ni and 2% Li doped ZnO thin film. The contribution of Ni metal to the EXAFS signal clearly reveals the presence of Ni clusters. The Ni-Ni distance in the Ni(0) nanoclusters, which are formed in the film, is shorter with respect to the reference Ni metal foil and the Debye-Waller factor is higher. Both facts perfectly reflect what is expected for metal nanoparticles. At the highest doping concentration (5%), the presence of Li favors the growth of a secondary NiO phase. Indeed, 2% Ni and 5% Li doped ZnO thin film shows %Nisub = 75 ± 11, %Nimet = 10 ± 8, %NiO = 15 ± 8. XANES studies further confirm that the substitutional Ni is more than 50% in all the samples. These results explain the observed magnetic properties. PMID:23988792

  18. Inverted fractal analysis of TiOx thin layers grown by inverse pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Égerházi, L.; Smausz, T.; Bari, F.

    2013-08-01

    Inverted fractal analysis (IFA), a method developed for fractal analysis of scanning electron microscopy images of cauliflower-like thin films is presented through the example of layers grown by inverse pulsed laser deposition (IPLD). IFA uses the integrated fractal analysis module (FracLac) of the image processing software ImageJ, and an objective thresholding routine that preserves the characteristic features of the images, independently of their brightness and contrast. IFA revealed fD = 1.83 ± 0.01 for TiOx layers grown at 5-50 Pa background pressures. For a series of images, this result was verified by evaluating the scaling of the number of still resolved features on the film, counted manually. The value of fD not only confirms the fractal structure of TiOx IPLD thin films, but also suggests that the aggregation of plasma species in the gas atmosphere may have only limited contribution to the deposition.

  19. Origin of resistivity change in NiO thin films studied by hard x-ray photoelectron spectroscopy

    SciTech Connect

    Calka, P.; Martinez, E.; Lafond, D.; Minoret, S.; Guedj, C.; Tirano, S.; Detlefs, B.; Roy, J.; Zegenhagen, J.

    2011-06-15

    We investigated origins of the resistivity change during the forming of NiO based resistive random access memories in a nondestructive way using hard x-ray photoelectron spectroscopy. Energy shifts and bandgap states observed after switching suggest that oxygen vacancies are created in the low resistive state. As a result conduction may occur via defects such as electrons traps and metallic nickel impurities. Migration of oxygen atoms seems to be the driving mechanism. This provides concrete evidence of the major role played by oxygen defects in decreasing resistivity. This is a key point since oxygen vacancies are particularly unstable and thus difficult to identify by physico-chemical analyses.

  20. Enhanced performance of room-temperature-grown epitaxial thin films of vanadium dioxide

    SciTech Connect

    Nag, Joyeeta; Payzant, E Andrew; More, Karren Leslie; HaglundJr., Richard F

    2011-01-01

    Stoichiometric vanadium dioxide in bulk, thin film and nanostructured forms exhibits an insulator-to-metal transition (IMT) accompanied by a structural phase transformation, induced by temperature, light, electric fields, doping or strain. We have grown epitaxial films of vanadium dioxide on c-plane (0001) of sapphire using two different procedures involving (1) room temperature growth followed by annealing and (2) direct high temperature growth. Strain at the film-substrate interface due to growth at different temperatures leads to interesting differences in morphologies and phase transition characteristics. Comparison of the morphologies and switching characteristics of the two films shows that contrary to conventional wisdom, the room-temperature grown films have smoother, more continuous morphologies and better switching performance, consistent with the behavior of epitaxially grown semiconductors.

  1. Flexible cadmium telluride thin films grown on electron-beam-irradiated graphene/thin glass substrates

    SciTech Connect

    Seo, Won-Oh; Kim, Jihyun; Koo, Yong Hwan; Kim, Byungnam; Lee, Byung Cheol; Kim, Donghwan

    2014-08-25

    We demonstrate the close-spaced sublimation growth of polycrystalline cadmium telluride (CdTe) thin films on a flexible graphene electrode/thin glass substrate structure. Prior to the growth of CdTe films, chemical-vapor-deposited graphene was transferred onto a flexible glass substrate and subjected to electron-beam irradiation at an energy of 0.2 MeV in order to intentionally introduce the defects into it in a controlled manner. Micro-Raman spectroscopy and sheet resistance measurements were employed to monitor the damage and disorder in the electron-beam irradiated graphene layers. The morphology and optical properties of the CdTe thin films deposited on a graphene/flexible glass substrate were systematically characterized. The integration of the defective graphene layers with a flexible glass substrate can be a useful platform to grow various thin-film structures for flexible electronic and optoelectronic devices.

  2. Adsorption properties of Mg-Al layered double hydroxides thin films grown by laser based techniques

    NASA Astrophysics Data System (ADS)

    Matei, A.; Birjega, R.; Vlad, A.; Filipescu, M.; Nedelcea, A.; Luculescu, C.; Zavoianu, R.; Pavel, O. D.; Dinescu, M.

    2012-09-01

    Powdered layered double hydroxides (LDHs) have been widely studied due to their applications as catalysts, anionic exchangers or host materials for inorganic and/or organic molecules. Assembling nano-sized LDHs onto flat solid substrates forming thin films is an expanding area of research due to the prospects of novel applications as sensors, corrosion-resistant coatings, components in optical and magnetic devices. Continuous and adherent thin films were grown by laser techniques (pulsed laser deposition - PLD and matrix assisted pulsed laser evaporation - MAPLE) starting from targets of Mg-Al LDHs. The capacity of the grown thin films to retain a metal (Ni) from contaminated water has been also explored. The thin films were immersed in an Ni(NO3)2 aqueous solutions with Ni concentrations of 10-3% (w/w) (1 g/L) and 10-4% (w/w) (0.1 g/L), respectively. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) combined with energy dispersive X-ray analysis (EDX) were the techniques used to characterize the prepared materials.

  3. Amorphous indium gallium zinc oxide thin film grown by pulse laser deposition technique

    NASA Astrophysics Data System (ADS)

    Mistry, Bhaumik V.; Joshi, U. S.

    2016-05-01

    Highly electrically conducting and transparent in visible light IGZO thin film were grown on glass substrate at substrate temperature of 400 C by a pulse laser deposition techniques. Structural, surface, electrical, and optical properties of IGZO thin films were investigated at room temperature. Smooth surface morphology and amorphous nature of the film has been confirmed from the AFM and GIXRD analysis. A resistivity down to 7.7×10-3 V cm was reproducibly obtained while maintaining optical transmission exceeding 70% at wavelengths from 340 to 780 nm. The carrier densities of the film was obtain to the value 1.9×1018 cm3, while the Hall mobility of the IGZO thin film was 16 cm2 V-1S-1.

  4. Biomolecular papain thin films grown by matrix assisted and conventional pulsed laser deposition: A comparative study

    NASA Astrophysics Data System (ADS)

    György, E.; Pérez del Pino, A.; Sauthier, G.; Figueras, A.

    2009-12-01

    Biomolecular papain thin films were grown both by matrix assisted pulsed laser evaporation (MAPLE) and conventional pulsed laser deposition (PLD) techniques with the aid of an UV KrF∗ (λ =248 nm, τFWHM≅20 ns) excimer laser source. For the MAPLE experiments the targets submitted to laser radiation consisted on frozen composites obtained by dissolving the biomaterial powder in distilled water at 10 wt % concentration. Conventional pressed biomaterial powder targets were used in the PLD experiments. The surface morphology of the obtained thin films was studied by atomic force microscopy and their structure and composition were investigated by Fourier transform infrared spectroscopy. The possible physical mechanisms implied in the ablation processes of the two techniques, under comparable experimental conditions were identified. The results showed that the growth mode, surface morphology as well as structure of the deposited biomaterial thin films are determined both by the incident laser fluence value as well as target preparation procedure.

  5. Raman spectroscopy of ZnMnO thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Orozco, S.; Riascos, H.; Duque, S.

    2016-02-01

    ZnMnO thin films were grown by Pulsed Laser Deposition (PLD) technique onto Silicon (100) substrates at different growth conditions. Thin films were deposited varying Mn concentration, substrate temperature and oxygen pressure. ZnMnO samples were analysed by using Raman Spectroscopy that shows a red shift for all vibration modes. Raman spectra revealed that nanostructure of thin films was the same of ZnO bulk, wurzite hexagonal structure. The structural disorder was manifested in the line width and shape variations of E2(high) and E2(low) modes located in 99 and 434cm-1 respectively, which may be due to the incorporation of Mn ions inside the ZnO crystal lattice. Around 570cm-1 was found a peak associated to E1(LO) vibration mode of ZnO. 272cm-1 suggest intrinsic host lattice defects. Additional mode centred at about 520cm-1 can be overlap of Si and Mn modes.

  6. Structural characterization of InSb thin films grown by electrodeposition

    SciTech Connect

    Singh, Joginder Rajaram, P.

    2015-06-24

    In the present work we have grown InSb thin films on brass substrates, using the electrodeposition technique. The electrochemical baths used in the growth were made up of aqueous solutions of InCl{sub 3} and SbCl{sub 3} mixed together in various proportions. The films grown were characterized by X-Ray diffraction (XRD), Scanning Electron Microscopy (SEM), and Energy Dispersive Analysis of X-rays (EDAX). Compositional studies show that stoichiometric InSb films can be prepared from a bath containing 0.05M InCl{sub 3} and 0.04M SbCl{sub 3}. XRD studies reveal that the films grown are polycrystalline having the zinc blende structure with (111) orientation. Crystallite size, dislocation density and strain were calculated using the XRD results. Optical transmission spectra were recorded using an FTIR spectrophotometer. The value of direct band gap was found to be around 0.20 eV for the thin films having the best stoichiometry.

  7. Self-assembled hierarchical 3D - NiO microspheres with ultra-thin porous nanoflakes for lithium-ion batteries

    NASA Astrophysics Data System (ADS)

    Jadhav, Harsharaj S.; Thorat, Gaurav M.; Mun, Junyoung; Seo, Jeong Gil

    2016-01-01

    Transition metal oxides have attracted great attention as an anode material for next generation lithium ion batteries. Here we report the preparation of self-assembled hierarchical 3D-NiO microspheres with ultra-thin porous nanoflakes by simple and cost effective urea assisted chemical co-precipitation method followed by annealing at different temperature. It is noteworthy that the annealing temperature has an impact on the formation of different morphologies and resultantly on the electrochemical performance. This hierarchical 3D-NiO microspheres with ultra-thin porous nanoflakes shows enhanced electrochemical performance with a large reversible capacity, superior cyclic performance, high rate capability, and improved ionic conductivity as an anode material for lithium ion batteries. A high reversible capacity up to 795 mA h g-1 after 150 cycles at a rate of 0.5 C, and a capacity higher than 460.2 mA h g-1 at a rate as high as 10 C were obtained for optimized NiO sample. In particular, enhancement of the electrochemical performance was attributed to the high specific surface area, good electric contact among the particles, and easier lithium ion diffusion.

  8. Space-charge behavior of 'Thin-MOS' diodes with MBE-grown silicon films

    NASA Technical Reports Server (NTRS)

    Lieneweg, U.; Bean, J. C.

    1984-01-01

    Basic theoretical and experimental characteristics of a novel 'Thin-MOS' technology, which has promising aspects for integrated high-frequency devices up to several hundred gigahertz are presented. The operation of such devices depends on charge injection into undoped silicon layers of about 1000-A thickness, grown by molecular beam epitaxy on heavily doped substrates, and isolation by thermally grown oxides of about 100-A thickness. Capacitance-voltage characteristics measured at high and low frequencies agree well with theoretical ones derived from uni and ambipolar space-charge models. It is concluded that after oxidation the residual doping in the epilayer is less than approximately 10 to the 16th/cu cm and rises by 3 orders of magnitude at the substrate interface within less than 100 A and that interface states at the oxide interface can be kept low.

  9. Oxygen measurements in thin ribbon silicon. [edge-defined film-fed grown

    NASA Technical Reports Server (NTRS)

    Hyland, S. L.; Ast, D. G.; Baghdadi, A.

    1987-01-01

    The oxygen content of thin silicon ribbons grown by the dendritic web technique was measured using a modification of the ASTM method based on Fourier transform infrared spectroscopy. Web silicon was found to have a high oxygen content, ranging from 13 to 19 ppma, calculated from the absorption peak associated with interstitial oxygen and using the new ASTM conversion coefficient. The oxygen concentration changed by about 10 percent along the growth direction of the ribbon. In some samples, a shoulder was detected on the absorption peak. A similar shoulder in Czochralski grown material has been variously interpreted in the literature as due to a complex of silicon, oxygen, and vacancies, or to a phase of SiO2 developed along dislocations in the material. In the case of web silicon, it is not clear which is the correct interpretation.

  10. Synthesis and characterization of TiO2 nanostructure thin films grown by thermal CVD

    NASA Astrophysics Data System (ADS)

    Rizal, Umesh; Das, Soham; Kumar, Dhruva; Swain, Bhabani S.; Swain, Bibhu P.

    2016-04-01

    Thermal Chemical Vapor Deposition (CVD) deposited Titanium dioxide nanostructures (TiO2-NSs) were grown by using Ti powder and O2 precursors on Si/SiO2 (100) substrate. The microstructure and vibration properties of TiO2-NSs were characterized by Fourier transform infrared (FTIR), SEM, and photoluminescence (PL) spectroscopy. The role of O2 flow rate on TiO2-NSs revealed decreased deposition rate, however, surface roughness has been increased resulted into formation of nanostructure thin films.

  11. One-dimensional edge state of Bi thin film grown on Si(111)

    SciTech Connect

    Kawakami, Naoya; Lin, Chun-Liang; Kawai, Maki; Takagi, Noriaki; Arafune, Ryuichi

    2015-07-20

    The geometric and electronic structures of the Bi thin film grown on Si(111) were investigated by using scanning tunneling microscopy and spectroscopy. We have found two types of edges, one of which hosts an electronic state localized one-dimensionally. We also revealed the energy dispersion of the localized edge state from the evolution of quasiparticle interference patterns as a function of energy. These spectroscopic findings well reproduce those acquired for the cleaved surface of the bulk Bi crystal [I. K. Drozdov et al., Nat. Phys. 10, 664 (2014)]. The present results indicate that the deposited Bi film provides a tractable stage for further scrutiny of the one-dimensional edge state.

  12. Microhardness studies on thin carbon films grown on P-type, (100) silicon

    NASA Technical Reports Server (NTRS)

    Kolecki, J. C.

    1982-01-01

    A program to grow thin carbon films and investigate their physical and electrical properties is described. Characteristics of films grown by rf sputtering and vacuum arc deposition on p type, (100) silicon wafers are presented. Microhardness data were obtained from both the films and the silicon via the Vickers diamond indentation technique. These data show that the films are always harder than the silicon, even when the films are thin (of the order of 1000 A). Vacuum arc films were found to contain black carbon inclusions of the order of a few microns in size, and clusters of inclusions of the order of tens of microns. Transmission electron diffraction showed that the films being studied were amorphous in structure.

  13. A study on the epitaxial Bi2Se3 thin film grown by vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Lin, Yen-Cheng; Chen, Yu-Sung; Lee, Chao-Chun; Wu, Jen-Kai; Lee, Hsin-Yen; Liang, Chi-Te; Chang, Yuan Huei

    2016-06-01

    We report the growth of high quality Bi2Se3 thin films on Al2O3 substrates by using chemical vapor deposition. From the atomic force microscope, x-ray diffraction and transmission electron microscope measurements we found that the films are of good crystalline quality, have two distinct domains and can be grown epitaxially on the Al2O3 substrate. Carrier concentration in the sample is found to be 1.1 × 1019 cm-3 between T = 2 K to T = 300 K, and electron mobility can reach 954 cm2/V s at T = 2 K. Weak anti-localization effect is observed in the low temperature magneto-transport measurement for the sample which indicates that the thin film has topological surface state.

  14. Highly crystalline MoS{sub 2} thin films grown by pulsed laser deposition

    SciTech Connect

    Serrao, Claudy R.; You, Long; Gadgil, Sushant; Hu, Chenming; Salahuddin, Sayeef; Diamond, Anthony M.; Hsu, Shang-Lin; Clarkson, James; Carraro, Carlo; Maboudian, Roya

    2015-02-02

    Highly crystalline thin films of MoS{sub 2} were prepared over large area by pulsed laser deposition down to a single monolayer on Al{sub 2}O{sub 3} (0001), GaN (0001), and SiC-6H (0001) substrates. X-ray diffraction and selected area electron diffraction studies show that the films are quasi-epitaxial with good out-of-plane texture. In addition, the thin films were observed to be highly crystalline with rocking curve full width half maxima of 0.01°, smooth with a RMS roughness of 0.27 nm, and uniform in thickness based on Raman spectroscopy. From transport measurements, the as-grown films were found to be p-type.

  15. Optical Properties Of {beta}-FeSi2 Thin Films Grown By Magnetron Sputtering

    SciTech Connect

    Tatar, B.; Kutlu, K.

    2007-04-23

    {beta}-FeSi2 semiconductor thin films have been grown on Si(100) and Si(111) substrate at room temperature by unbalanced magnetron sputtering. The thicknesses of {beta}-FeSi2 thin films have been prepared to have value between 0.3-1{mu}m. Optical characteristic of the {beta}-FeSi2 films have been deduced using Fourier Transform Infrared Spectroscopy (FT-IR) in the wavelength range 1000-2000nm. The {beta}-FeSi2 films have been determinated to have optical direct band gap from the plot of ({alpha}h{upsilon})2 vs. h{upsilon} The direct band gap values of the films have been observed to vary between 0.82-0.89 eV depending on the type of substrates.

  16. Scaling behavior of ZnPc thin films grown on CuI interlayers

    NASA Astrophysics Data System (ADS)

    Lee, Jinho; Jin, Sung-Il; Park, Chan Ryang; Yim, Sanggyu

    2015-01-01

    The growth behavior and consequent surface morphology evolution of zinc phthalocyanine (ZnPc) thin films deposited on a CuI interlayer were studied using atomic force microscopy and height difference correlation function (HDCF) analysis. The planar phthalocyanine thin films grown on non-interacting substrates have previously been reported to show anomalous scaling behavior such as large growth exponents, ß, sometimes larger than 0.5, and small anomaly values, ρ, typically smaller than 0.6. In contrast, ZnPc thin films on a CuI interlayer (CuI/ ZnPc) in this work showed conventional scaling behavior with a ß value of 0.26 ± 0.05 and a ρ value of 0.91. The HDCF analyses and x-ray diffraction results indicate that the expected interdigitated electron donor-acceptor interface was hardly formed for the CuI/ZnPc thin film system due to the lack of surface-parallel crystallites with high step edge barriers.

  17. Direct synthesis of porous NiO nanowall arrays on conductive substrates for supercapacitor application

    SciTech Connect

    Zhu, Jianhui; Jiang, Jian; Liu, Jingping; Ding, Ruimin; Ding, Hao; Feng, Yamin; Wei, Guangming; Huang, Xintang

    2011-03-15

    Porous NiO nanowall arrays (NWAs) grown on flexible Fe-Co-Ni alloy have been successfully synthesized by using nullaginite (Ni{sub 2}(OH){sub 2}CO{sub 3}) as precursor and investigated as supercapacitor electrodes. In details, we adopted a simple hydrothermal method to realize Ni{sub 2}(OH){sub 2}CO{sub 3} NWAs and examined their robust mechanical adhesion to substrate via a long-time ultrasonication test. Porous NiO NWAs were then obtained by a post-calcination towards precursors at 500 {sup o}C in nitrogen atmosphere. Electrochemical properties of as-synthesized NiO NWAs were evaluated by cyclic voltammetry and galvanostatic charge/discharge; porous NiO NWAs electrode delivered a specific capacitance of 270 F/g (0.67 A/g); even at high current densities, the electrode could still deliver a high capacitance up to 236 F/g (13.35 A/g). Meanwhile, it exhibited excellent cycle lifetime with {approx}93% specific capacitance kept after 4000 cycles. These results suggest that as-made porous NiO NWAs electrode is a promising candidate for future thin-film supercapacitors and other microelectronic systems. -- Graphical abstract: Porous NiO nanowall arrays (NWAs) grown on alloy substrate have been made using nullaginite as precursor and studied as supercapacitor electrodes. Porous nanowalls interconnected with each other resulting in the formation of extended-network architectures and exhibited excellent capacitor properties. NiO NWAs electrode delivered a capacitance of 270 F/g (0.67 A/g); even at high current density, the electrode could still deliver a high capacitance up to 236 F/g (13.35 A/g). Besides, it exhibited excellent cycle lifetime with {approx}93% capacitance kept after 4000 cycles. These remarkable results made it possible for mass production of NiO NWAs and future thin-film microelectronic applications. Display Omitted Research highlights: {yields} Large-scale nullaginite (Ni{sub 2}(OH){sub 2}CO{sub 3}) nanowall arrays (NWAs) have been synthesized on

  18. Growth mechanism of CuZnInSe2 thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Tseng, Ya Hsin; Yang, Chu Shou; Wu, Chia Hsing; Chiu, Jai Wei; Yang, Min De; Wu, Chih-Hung

    2013-09-01

    CuZnInSe2 (CZIS) has potential application in solar cell for absorption layer, and give an advantage to change the band gap from CuInSe2 (1.02 eV) to ZnSe (2.67 eV). Using molecular beam epitaxy technology, the CZIS thin films were grown via CuInSe (CIS) and ZnSe base. In the case of CIS, thin films were grown on Mo-coated soda lime glass with various zinc flux. CIS was transformed into chalcopyrite and sphalerite coexisting CZIS easily but it is difficult to transform into the pure sphalerite CZIS. Zn/(Zn+In+Cu) ratio has limited to approximate 36 at% and the excess-Zn played a catalyst role. In the case of ZnSe base, which was grown on GaAs (001), various In and Cu flux defined as the TIn series and TCu series, respectively. There are four types of compound in the TIn series and TCu series, including ZnSe, InxSey, ZnIn2Se4 (ZIS) and CZIS. In the TIn series under the lowest In and Cu flux, selenium (Se) were randomly combined with cations to form the CZIS. When TIn is increased in this moment, the CZIS was transformed into ZIS. In the TCu series, CZIS demonstrated via In-rich ZIS (Zn(In, Cu)Se) and InxSey base ((Zn, Cu)InSe). It is chalcopyrite and sphalerite coexisting structure in the medium TCu region. In the high TCu region, it is transformed into the Zn-poor and Cu-rich CZIS.

  19. Hydroxyapatite thin films grown by pulsed laser deposition and radio-frequency magnetron sputtering: comparative study

    NASA Astrophysics Data System (ADS)

    Nelea, V.; Morosanu, C.; Iliescu, M.; Mihailescu, I. N.

    2004-04-01

    Hydroxyapatite (HA) thin films for applications in the biomedical field were grown by pulsed laser deposition (PLD) and radio-frequency magnetron sputtering (RF-MS) techniques. The depositions were performed from pure hydroxyapatite targets on Ti-5Al-2.5Fe (TiAlFe) alloys substrates. In order to prevent the HA film penetration by Ti atoms or ions diffused from the Ti-based alloy during and after deposition, the substrates were pre-coated with a thin buffer layer of TiN. In both cases, TiN was introduced by reactive PLD from TiN targets in low-pressure N 2. The PLD films were grown in vacuum onto room temperature substrates. The RF-MS films were deposited in low-pressure argon on substrates heated at 550 °C. The initially amorphous PLD thin films were annealed at 550 °C for 1 h in ambient air in order to restore the initial crystalline structure of HA target. The thickness of the PLD and RF-MS films were ˜1 μm and ˜350 nm, respectively. All films were structurally studied by scanning electron microscopy (SEM), grazing incidence X-ray diffraction (GIXRD), energy dispersive X-ray spectrometry (EDS) and white light confocal microscopy (WLCM). The mechanical properties of the films were tested by Berkovich nano-indentation. Both PLD and RF-MS films mostly contain HA phase and exhibit good mechanical characteristics. Peaks of CaO were noticed as secondary phase in the GIXRD patterns only for RF-MS films. By its turn, the sputtered films were smoother as compared to the ones deposited by PLD (50 nm versus 250 nm average roughness). The RF-MS films were harder, more mechanically resistant and have a higher Young modulus.

  20. Induced polarized state in intentionally grown oxygen deficient KTaO{sub 3} thin films

    SciTech Connect

    Mota, D. A.; Romaguera-Barcelay, Y.; Tkach, A.; Agostinho Moreira, J.; Almeida, A.; Perez de la Cruz, J.; Vilarinho, P. M.; Tavares, P. B.

    2013-07-21

    Deliberately oxygen deficient potassium tantalate thin films were grown by RF magnetron sputtering on Si/SiO{sub 2}/Ti/Pt substrates. Once they were structurally characterized, the effect of oxygen vacancies on their electric properties was addressed by measuring leakage currents, dielectric constant, electric polarization, and thermally stimulated depolarization currents. By using K{sub 2}O rich KTaO{sub 3} targets and specific deposition conditions, KTaO{sub 3-{delta}} oxygen deficient thin films with a K/Ta = 1 ratio were obtained. Room temperature X-ray diffraction patterns show that KTaO{sub 3-{delta}} thin films are under a compressive strain of 2.3% relative to KTaO{sub 3} crystals. Leakage current results reveal the presence of a conductive mechanism, following the Poole-Frenkel formalism. Furthermore, dielectric, polarization, and depolarization current measurements yield the existence of a polarized state below T{sub pol} {approx} 367 Degree-Sign C. A Cole-Cole dipolar relaxation was also ascertained apparently due to oxygen vacancies induced dipoles. After thermal annealing the films in an oxygen atmosphere at a temperature above T{sub pol}, the aforementioned polarized state is suppressed, associated with a drastic oxygen vacancies reduction emerging from annealing process.

  1. Photoluminescence of localized excitons in ZnCdO thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Wu, T. Y.; Huang, Y. S.; Hu, S. Y.; Lee, Y. C.; Tiong, K. K.; Chang, C. C.; Shen, J. L.; Chou, W. C.

    2016-07-01

    We have investigated the luminescence characteristics of Zn1-xCdxO thin films with different Cd contents grown by molecular beam epitaxy system. The temperature-dependent photoluminescence (PL) and excitation power-dependent PL spectra were measured to clarify the luminescence mechanisms of the Zn1-xCdxO thin films. The peak energy of the Zn1-xCdxO thin films with increasing the Cd concentration is observed as redshift and can be fitted by the quadratic function of alloy content. The broadened full-width at half-maximum (FWHM) estimated from the 15 K PL spectra as a function of Cd content shows a larger deviation between the experimental values and theoretical curve, which indicates that experimental FWHM values are affected not only by alloy compositional disorder but also by localized excitons occupying states in the tail of the density of states. The Urbach energy determined from an analysis of the lineshape of the low-energy side of the PL spectrum and the degree of localization effect estimated from the temperature-induced S-shaped PL peak position described an increasing mean exciton-localization effects in ZnCdO films with increasing the Cd content. In addition, the PL intensity and peak position as a function of excitation power are carried out to clarify the types of radiative recombination and the effects of localized exciton in the ZnCdO films with different Cd contents.

  2. Angle-resolved X-ray photoelectron spectroscopy of topmost surface for LaNiO 3 thin film grown on SrTiO 3 substrate by laser molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Chen, P.; Xu, S. Y.; Lin, J.; Ong, C. K.; Cui, D. F.

    1999-01-01

    The LaNiO 3 thin film was grown on SrTiO 3 (001) substrate by computer-controlled laser molecular beam epitaxy (laser MBE). In situ monitoring of the growing film surface was performed with a reflection high energy electron diffraction (RHEED). Angle-resolved X-ray photoelectron spectroscopy (ARXPS) indicated that the terminating plane of the LaNiO 3 film was the LaO atomic plane, and the SrTiO 3 (001) surfaces of as-supplied substrate as well as HF-pretreated substrate were predominantly terminated with TiO atomic plane. The structural conversion of the topmost atomic layer from NiO to LaO occurred during the LaNiO 3 epitaxial growth process.

  3. The magnetic and chemical structural property of the epitaxially-grown multilayered thin film

    NASA Astrophysics Data System (ADS)

    Lee, Hwachol

    L10 FePt- and Fe-related alloys such as FePtRh, FeRh and FeRhPd have been studied for the high magnetocrystalline anisotropy and magnetic phase transition property for the future application. In this work, the thin film structural and magnetic property is investigated for the selected FePtRh and FeRhPd alloys. The compositionally-modulated L10 FePtRh multilayered structure is grown epitaxially on a-plane Al2O3 with Cr and Pt buffer layer at 600degC growth temperature by DC sputtering technique and examined for the structural, interfacial and magnetic property. For the epitaxially grown L10 [Fe50Pt45Rh5 (FM) (10nm) / Fe50Pt25Rh25 (AFM) (20nm)]x8 superlattice, the magnetically and chemically sharp interface formation between layers was observed in X-ray diffraction, transmission electron microscopy and polarized neutron reflectivity measurements with the negligible exchange bias at room and a slight coupling effect at lower temperature regime. For FeRhPd, the magnetic phase transition of epitaxially-grown 111-oriented Fe46Rh48Pd6 thin film is studied. The applied Rhodium buffer layer on a-plane Al2O3 (11 20) at 600degC shows the extraordinarily high quality of epitaxial film in (111) orientation, where two broad and coherent peak in rocking curve, and Laue oscillations are observed. The epitaxially-grown Pd-doped FeRh on Pt (111) grown at 600degC, 700degC exhibits the co-existing stable L10 (111) and B2 (110) structures and magnetic phase transition around 300degC. On the other hand, the partially-ordered FeRhPd structure grown at 400degC, 500degC shows background high ferromagnetic state over 5K˜350K temperature. For the reduced thickness of Fe46Rh48Pd 6, the ferromagnetic state becomes dominant with a reduced portion of the film undergoing a magnetic phase transition. For some epitaxial FeRhPd film, the spin-glass-like disordered state is also observed in field dependent SQUID measurement. For the tri-layered FeRhPd with thin Pt spacer, the background

  4. As-grown superconducting Bi-Sr-Ca-Cu-O thin films by coevaporation

    SciTech Connect

    Satoh, T.; Yoshitake, T.; Miura, S.; Fujita, J.; Kubo, Y.; Igarashi, H.

    1989-08-14

    Superconducting Bi-Sr-Ca-Cu-O thin films have been prepared on (100) MgO substrates at about 600 /degree/C by coevaporation. The /ital c/-axis lattice constant of this system was controlled to the values of 24--43 A by changing film composition. Superconducting transition temperatures of these films were affected by substrate temperature and by a post-deposition annealing at a low temperature. The highest zero resistance temperature (/ital T//sub /ital c/, zero/) of the as-grown Bi/sub 2/(Sr,Ca)/sub 3/Cu/sub 2/O/sub /ital x// film was 79 K. The best Bi/sub 2/(Sr, Ca)/sub 4/Cu/sub 3/O/sub /ital x// film showed an onset temperature of 105 K and /ital T//sub /ital c/, zero/ zero of 78 K after annealing at 400 /degree/C for 1 h.

  5. Structural and optical characterization of MOCVD-grown ZnO thin films

    NASA Astrophysics Data System (ADS)

    Pagni, O.; James, G. R.; Leitch, A. W. R.

    2004-03-01

    We report on the characterization of ZnO thin films grown by metal organic chemical vapor deposition (MOCVD) using diethyl zinc (DEZ) and tert-butanol (TBOH) as precursors. Substrate temperature proved to be a crucial factor in the crystallization process, as it vastly impacted the structural properties of the samples studied. Highly c-axis oriented films with large grain size (52 nm), low tensile strain (0.6%), uniform substrate coverage and a columnar structure devoid of hexagonal needles were successfully deposited on n-Si (100) substrates. The temperature-dependent luminescence spectra recorded confirmed the excellent quality of the material obtained in this work. Our results so far set TBOH apart as an outstanding oxygen source for the MOCVD growth of ZnO.

  6. Nanocolumnar association and domain formation in porous thin films grown by evaporation at oblique angles.

    PubMed

    Lopez-Santos, C; Alvarez, R; Garcia-Valenzuela, A; Rico, V; Loeffler, M; Gonzalez-Elipe, A R; Palmero, A

    2016-09-30

    Porous thin films grown at oblique angles by evaporation techniques are formed by tilted nanocolumnar structures which, depending on the material type and growth conditions, associate along certain preferential directions, giving rise to large domains. This arrangement, commonly denoted as bundling association, is investigated in the present work by performing fundamental experiments and growth simulations. It is proved that trapping processes of vapor species at the film surface, together with the shadowing mechanism, mediate the anisotropic widening of the nanocolumns and promote their preferential coalescence along certain directions, giving rise to domains with different shape and size. The role of these two processes is thoroughly studied in connection with the formation of these domains in materials as different as SiO2 and TiO2. PMID:27535651

  7. Optical and mechanical properties of nanocrystalline ZrC thin films grown by pulsed laser deposition.

    SciTech Connect

    Craciun, D.; Socol, G.; Lambers, E.; McCumiskey, E. J.; Taylor, C. R.; Martin, C.; Argibay, Nicolas; Craciun, V.; Tanner, D. B.

    2015-01-17

    Thin ZrC films (<500 nm) were grown on (100) Si substrates at a substrate temperature of 500 °C by the pulsed laser deposition (PLD) technique using a KrF excimer laser under different CH4 pressures. Glancing incidence X-ray diffraction showed that films were nanocrystalline, while X-ray reflectivity studies found out films were very dense and exhibited a smooth surface morphology. Optical spectroscopy data shows that the films have high reflectivity (>90%) in the infrared region, characteristic of metallic behavior. Nanoindentation results indicated that films deposited under lower CH4 pressures exhibited slightly higher nanohardness and Young modulus values than films deposited under higher pressures. As a result, tribological characterization revealed that these films exhibited relatively high wear resistance and steady-state friction coefficients on the order of μ = 0.4.

  8. Optical and mechanical properties of nanocrystalline ZrC thin films grown by pulsed laser deposition.

    DOE PAGESBeta

    Craciun, D.; Socol, G.; Lambers, E.; McCumiskey, E. J.; Taylor, C. R.; Martin, C.; Argibay, Nicolas; Craciun, V.; Tanner, D. B.

    2015-01-17

    Thin ZrC films (<500 nm) were grown on (100) Si substrates at a substrate temperature of 500 °C by the pulsed laser deposition (PLD) technique using a KrF excimer laser under different CH4 pressures. Glancing incidence X-ray diffraction showed that films were nanocrystalline, while X-ray reflectivity studies found out films were very dense and exhibited a smooth surface morphology. Optical spectroscopy data shows that the films have high reflectivity (>90%) in the infrared region, characteristic of metallic behavior. Nanoindentation results indicated that films deposited under lower CH4 pressures exhibited slightly higher nanohardness and Young modulus values than films deposited undermore » higher pressures. As a result, tribological characterization revealed that these films exhibited relatively high wear resistance and steady-state friction coefficients on the order of μ = 0.4.« less

  9. Epitaxially grown polycrystalline silicon thin-film solar cells on solid-phase crystallised seed layers

    NASA Astrophysics Data System (ADS)

    Li, Wei; Varlamov, Sergey; Xue, Chaowei

    2014-09-01

    This paper presents the fabrication of poly-Si thin film solar cells on glass substrates using seed layer approach. The solid-phase crystallised P-doped seed layer is not only used as the crystalline template for the epitaxial growth but also as the emitter for the solar cell structure. This paper investigates two important factors, surface cleaning and intragrain defects elimination for the seed layer, which can greatly influence the epitaxial grown solar cell performance. Shorter incubation and crystallisation time is observed using a simplified RCA cleaning than the other two wet chemical cleaning methods, indicating a cleaner seed layer surface is achieved. Cross sectional transmission microscope images confirm a crystallographic transferal of information from the simplified RCA cleaned seed layer into the epi-layer. RTA for the SPC seed layer can effectively eliminate the intragrain defects in the seed layer and improve structural quality of both of the seed layer and the epi-layer. Consequently, epitaxial grown poly-Si solar cell on the RTA treated seed layer shows better solar cell efficiency, Voc and Jsc than the one on the seed layer without RTA treatment.

  10. Highly Crystalline CVD-grown Multilayer MoSe2 Thin Film Transistor for Fast Photodetector

    PubMed Central

    Jung, Chulseung; Kim, Seung Min; Moon, Hyunseong; Han, Gyuchull; Kwon, Junyeon; Hong, Young Ki; Omkaram, Inturu; Yoon, Youngki; Kim, Sunkook; Park, Jozeph

    2015-01-01

    Hexagonal molybdenum diselenide (MoSe2) multilayers were grown by chemical vapor deposition (CVD). A relatively high pressure (>760 Torr) was used during the CVD growth to achieve multilayers by creating multiple nuclei based on the two-dimensional crystal growth model. Our CVD-grown multilayer MoSe2 thin-film transistors (TFTs) show p-type-dominant ambipolar behaviors, which are attributed to the formation of Se vacancies generated at the decomposition temperature (650 °C) after the CVD growth for 10 min. Our MoSe2 TFT with a reasonably high field-effect mobility (10 cm2/V · s) exhibits a high photoresponsivity (93.7 A/W) and a fast photoresponse time (τrise ~ 0.4 s) under the illumination of light, which demonstrates the practical feasibility of multilayer MoSe2 TFTs for photodetector applications. PMID:26477744

  11. Electrochromism and photocatalysis in dendrite structured Ti:WO3 thin films grown by sputtering

    NASA Astrophysics Data System (ADS)

    Karuppasamy, A.

    2015-12-01

    Titanium doped tungsten oxide (Ti:WO3) thin films with dendrite surface structures were grown by co-sputtering titanium and tungsten in Ar + O2 atmosphere. Ti:WO3 thin films were deposited at oxygen flow rates corresponding to pressures in the range 1.0 × 10-3-5.0 × 10-3 mbar. Argon flow rate and sputtering power densities for titanium (2 W/cm2) and tungsten (3 W/cm2) were kept constant. Ti:WO3 films deposited at an oxygen pressure of 5 × 10-3 mbar are found to be better electrochromic and photocatalytic. They have high optical modulation (80% at λ = 550 nm), coloration efficiency (60 cm2/C at λ = 550 nm), electron/ion storage and removal capacity (Qc: -22.01 mC/cm2, Qa: 17.72 mC/cm2), reversibility (80%) and methylene blue decomposition rate (-1.38 μmol/l d). The combined effects of titanium doping, dendrite surface structures and porosity leads to significant enhancement in the electrochromic and photocatalytic properties of Ti:WO3 films.

  12. A kinetic model for stress generation in thin films grown from energetic vapor fluxes

    NASA Astrophysics Data System (ADS)

    Chason, E.; Karlson, M.; Colin, J. J.; Magnfält, D.; Sarakinos, K.; Abadias, G.

    2016-04-01

    We have developed a kinetic model for residual stress generation in thin films grown from energetic vapor fluxes, encountered, e.g., during sputter deposition. The new analytical model considers sub-surface point defects created by atomic peening, along with processes treated in already existing stress models for non-energetic deposition, i.e., thermally activated diffusion processes at the surface and the grain boundary. According to the new model, ballistically induced sub-surface defects can get incorporated as excess atoms at the grain boundary, remain trapped in the bulk, or annihilate at the free surface, resulting in a complex dependence of the steady-state stress on the grain size, the growth rate, as well as the energetics of the incoming particle flux. We compare calculations from the model with in situ stress measurements performed on a series of Mo films sputter-deposited at different conditions and having different grain sizes. The model is able to reproduce the observed increase of compressive stress with increasing growth rate, behavior that is the opposite of what is typically seen under non-energetic growth conditions. On a grander scale, this study is a step towards obtaining a comprehensive understanding of stress generation and evolution in vapor deposited polycrystalline thin films.

  13. Growth Parameters for Thin Film InBi Grown by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Keen, B.; Makin, R.; Stampe, P. A.; Kennedy, R. J.; Sallis, S.; Piper, L. J.; McCombe, B.; Durbin, S. M.

    2014-04-01

    The alloying of bismuth with III-V semiconductors, in particular GaAs and InAs thin films grown by molecular beam epitaxy (MBE), has attracted considerable interest due to the accompanying changes in band structure and lattice constant. Specifically, bismuth incorporation in these compounds results in both a reduction in band gap (through shifting of the valence band) and an increase in the lattice constant of the alloy. To fully understand the composition of these alloys, a better understanding of the binary endpoints is needed. At present, a limited amount of literature exists on the III-Bi family of materials, most of which is theoretical work based on density functional theory calculations. The only III-Bi material known to exist (in bulk crystal form) is InBi, but its electrical properties have not been sufficiently studied and, to date, the material has not been fabricated as a thin film. We have successfully deposited crystalline InBi on (100) GaAs substrates using MBE. Wetting of the substrate is poor, and regions of varying composition exist across the substrate. To obtain InBi, the growth temperature had to be below 100 °C. It was found that film crystallinity improved with reduced Bi flux, into an In-rich regime. Additionally, attempts were made to grow AlBi and GaBi.

  14. Characterization of strontium barium niobate optical thin film grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Liu, H.; Li, S.; Fernandez, F. E.; Jia, W.; Liu, G.

    1999-12-01

    Optical quality thin films of strontium barium niobate SrxBa1-xNb2O6 either undoped or Eu3+-doped has been successfully grown on fused quartz substrates using pulsed laser deposition (PLD) technique. The optical properties were characterized in either time domain or in frequency domain. Undoped SBN thin films show a broad-band emission at UV, extending to the visible, which attributes to the exciton luminescence of the SBN host in the film. High-resolution nonlinear optical response in the picosecond region, as well as the third-order susceptibility were characterized by degenerate four-wave-mixing (DFWM) measurements. A considerable enhancement, by 2 orders of magnitude, of the third order nonlinear susceptibility χ(3) in transverse alignment was observed with respect to the bulk values. Eu3+-doped SBN films show a significant change in optical properties with annealing process. The fine structure of 5D0 to 7F multiplet emission was well resolved in the annealed sample. In a hole-burning experiment, a hole of width 100 MHz with depth as high as 30% was burnt using laser pumping at 5774 Å. It is suggested that Eu3+ ions may substitute Nb, occupying 6-fold sites.

  15. Characterization of strontium barium niobate optical thin film grown by pulsed laser deposition

    SciTech Connect

    Liu, H.; Fernandez, F. E.; Jia, W.; Li, S.; Liu, G.

    1999-12-02

    Optical quality thin films of strontium barium niobate Sr{sub x}Ba{sub 1-x}Nb{sub 2}O{sub 6} either undoped or Eu{sup 3+}-doped has been successfully grown on fused quartz substrates using pulsed laser deposition (PLD) technique. The optical properties were characterized in either time domain or in frequency domain. Undoped SBN thin films show a broad-band emission at UV, extending to the visible, which attributes to the exciton luminescence of the SBN host in the film. High-resolution nonlinear optical response in the picosecond region, as well as the third-order susceptibility were characterized by degenerate four-wave-mixing (DFWM) measurements. A considerable enhancement, by 2 orders of magnitude, of the third order nonlinear susceptibility {chi}{sup (3)} in transverse alignment was observed with respect to the bulk values. Eu{sup 3+}-doped SBN films show a significant change in optical properties with annealing process. The fine structure of {sup 5}D{sub 0} to {sup 7}F multiplet emission was well resolved in the annealed sample. In a hole-burning experiment, a hole of width 100 MHz with depth as high as 30% was burnt using laser pumping at 5774 A. It is suggested that Eu{sup 3+} ions may substitute Nb, occupying 6-fold sites.

  16. Preparation and characterization of epitaxially grown unsupported yttria-stabilized zirconia (YSZ) thin films

    NASA Astrophysics Data System (ADS)

    Götsch, Thomas; Mayr, Lukas; Stöger-Pollach, Michael; Klötzer, Bernhard; Penner, Simon

    2015-03-01

    Epitaxially grown, chemically homogeneous yttria-stabilized zirconia thin films ("YSZ", 8 mol% Y2O3) are prepared by direct-current sputtering onto a single-crystalline NaCl(0 0 1) template at substrate temperatures ≥493 K, resulting in unsupported YSZ films after floating off NaCl in water. A combined methodological approach by dedicated (surface science) analytical characterization tools (transmission electron microscopy and diffraction, atomic force microscopy, angle-resolved X-ray photoelectron spectroscopy) reveals that the film grows mainly in a [0 0 1] zone axis and no Y-enrichment in surface or bulk regions takes place. In fact, the Y-content of the sputter target is preserved in the thin films. Analysis of the plasmon region in EEL spectra indicates a defective nature of the as-deposited films, which can be suppressed by post-deposition oxidation at 1073 K. This, however, induces considerable sintering, as deduced from surface morphology measurements by AFM. In due course, the so-prepared unsupported YSZ films might act as well-defined model systems also for technological applications.

  17. Systematic process development towards high performance transferred thin silicon solar cells based on epitaxially grown absorbers

    NASA Astrophysics Data System (ADS)

    Murcia Salazar, Clara Paola

    ). First principles modeling, however, predicts that efficiencies of 20+% are achievable with less than 20 mum of c-Si. In addition to a high voltage design, this work reports state of the art epitaxial c-Si solar cell performance and a path towards 20+%-efficient transferred epitaxial solar cells. The design and fabrication approach is based on high open circuit voltage first, high short circuit current second. A first design is a thin solar cell grown on a conductive silicon wafer. This structure allows developing processes to increase bulk lifetime and reduce surface recombination. Important processes that can be used for a transferred solar cell such as increased fill factor (FF) are developed at this stage. A second design is based on the use of a separation layer prior to the solar cell growth. We achieve a comparable performance with the second design. A third design includes the transfer of the solar cell to a secondary substrate. Initial processing development is reported for the transferred solar cells. Improvements in solar cell critical parameters have been characterized with a combination of predictive modeling and solar cell diagnostic tools such as quantum efficiency and voltage measurements. Fabrication processes have been developed to improve solar cell performance. The combination of process development, test structures, systematic fabrication, testing and analysis concludes with a path to high voltage, transferred thin c-Si solar cells towards 20+% efficiencies.

  18. Effect of precursor on epitaxially grown of ZnO thin film on p-GaN/sapphire (0 0 0 1) substrate by hydrothermal technique

    SciTech Connect

    Sahoo, Trilochan; Ju, Jin-Woo; Kannan, V.; Kim, Jin Soo; Yu, Yeon-Tae; Han, Myung-Soo; Park, Young-Sik; Lee, In-Hwan

    2008-03-04

    Single crystalline ZnO thin film on p-GaN/sapphire (0 0 0 1) substrate, using two different precursors by hydrothermal route at a temperature of 90 deg. C were successfully grown. The effect of starting precursor on crystalline nature, surface morphology and optical emission of the films were studied. ZnO thin films were grown in aqueous solution of zinc acetate and zinc nitrate. X-ray diffraction analysis revealed that all the thin films were single crystalline in nature and exhibited wurtzite symmetry and c-axis orientation. The thin films obtained with zinc nitrate had a more pitted rough surface morphology compared to the film grown in zinc acetate. However the thickness of the films remained unaffected by the nature of the starting precursor. Sharp luminescence peaks were observed from the thin films almost at identical energies but deep level emission was slightly prominent for the thin film grown in zinc nitrate.

  19. Structural and Magnetic Phase Transitions in Manganese Arsenide Thin-Films Grown by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Jaeckel, Felix Till

    Phase transitions play an important role in many fields of physics and engineering, and their study in bulk materials has a long tradition. Many of the experimental techniques involve measurements of thermodynamically extensive parameters. With the increasing technological importance of thin-film technology there is a pressing need to find new ways to study phase transitions at smaller length-scales, where the traditional methods are insufficient. In this regard, the phase transitions observed in thin-films of MnAs present interesting challenges. As a ferromagnetic material that can be grown epitaxially on a variety of technologically important substrates, MnAs is an interesting material for spintronics applications. In the bulk, the first order transition from the low temperature ferromagnetic alpha-phase to the beta-phase occurs at 313 K. The magnetic state of the beta-phase has remained controversial. A second order transition to the paramagnetic gamma-phase takes place at 398 K. In thin-films, the anisotropic strain imposed by the substrate leads to the interesting phenomenon of coexistence of alpha- and beta-phases in a regular array of stripes over an extended temperature range. In this dissertation these phase transitions are studied in films grown by molecular beam epitaxy on GaAs (001). The films are confirmed to be of high structural quality and almost purely in the A0 orientation. A diverse set of experimental techniques, germane to thin-film technology, is used to probe the properties of the film: Temperature-dependent X-ray diffraction and atomic-force microscopy (AFM), as well as magnetotransport give insights into the structural properties, while the anomalous Hall effect is used as a probe of magnetization during the phase transition. In addition, reflectance difference spectroscopy (RDS) is used as a sensitive probe of electronic structure. Inductively coupled plasma etching with BCl3 is demonstrated to be effective for patterning MnAs. We show

  20. Comparative study of ITO and FTO thin films grown by spray pyrolysis

    SciTech Connect

    Ait Aouaj, M.; Diaz, R.; Belayachi, A.; Rueda, F.; Abd-Lefdil, M.

    2009-07-01

    Tin doped indium oxide (ITO) and fluorine doped tin oxide (FTO) thin films have been prepared by one step spray pyrolysis. Both film types grown at 400 deg. C present a single phase, ITO has cubic structure and preferred orientation (4 0 0) while FTO exhibits a tetragonal structure. Scanning electron micrographs showed homogeneous surfaces with average grain size around 257 and 190 nm for ITO and FTO respectively. The optical properties have been studied in several ITO and FTO samples by transmittance and reflectance measurements. The transmittance in the visible zone is higher in ITO than in FTO layers with a comparable thickness, while the reflectance in the infrared zone is higher in FTO in comparison with ITO. The best electrical resistivity values, deduced from optical measurements, were 8 x 10{sup -4} and 6 x 10{sup -4} {Omega} cm for ITO (6% of Sn) and FTO (2.5% of F) respectively. The figure of merit reached a maximum value of 2.15 x 10{sup -3} {Omega}{sup -1} for ITO higher than 0.55 x 10{sup -3} {Omega}{sup -1} for FTO.

  1. Magnetic and structural properties of Co2FeAl thin films grown on Si substrate

    NASA Astrophysics Data System (ADS)

    Belmeguenai, Mohamed; Tuzcuoglu, Hanife; Gabor, Mihai; Petrisor, Traian; Tiusan, Coriolan; Berling, Dominique; Zighem, Fatih; Mourad Chérif, Salim

    2015-01-01

    The correlation between magnetic and structural properties of Co2FeAl (CFA) thin films of different thicknesses (10 nmgrown at room temperature on MgO-buffered Si/SiO2 substrates and annealed at 600 °C has been studied. x-ray diffraction (XRD) measurements revealed an (011) out-of-plane textured growth of the films. The deduced lattice parameter increases with the film thickness. Moreover, pole figures showed no in-plane preferential growth orientation. The magneto-optical Kerr effect hysteresis loops showed the presence of a weak in-plane uniaxial anisotropy with a random easy axis direction. The coercive field, measured with the applied field along the easy axis direction, and the uniaxial anisotropy field increase linearly with the inverse of the CFA thickness. The microstrip line ferromagnetic resonance measurements for in-plane and perpendicular applied magnetic fields revealed that the effective magnetization and the uniaxial in-plane anisotropy field follow a linear variation versus the inverse CFA thickness. This allows deriving a perpendicular surface anisotropy coefficient of -1.86 erg/cm2.

  2. Transparent conductive Al-doped ZnO thin films grown at room temperature

    SciTech Connect

    Wang Yuping; Lu Jianguo; Bie Xun; Gong Li; Li Xiang; Song Da; Zhao Xuyang; Ye Wenyi; Ye Zhizhen

    2011-05-15

    Aluminum-doped ZnO (ZnO:Al, AZO) thin films were prepared on glass substrates by dc reactive magnetron sputtering from a Zn-Al alloy target at room temperature. The effects of the Ar-to-O{sub 2} partial pressure ratios on the structural, electrical, and optical properties of AZO films were studied in detail. AZO films grown using 100:4 to 100:8 Ar-to-O{sub 2} ratio result in acceptable quality films with c-axis orientated crystals, uniform grains, 10{sup -3} {Omega} cm resistivity, greater than 10{sup 20} cm{sup -3} electron concentration, and high transmittance, 90%, in the visible region. The lowest resistivity of 4.11x10{sup -3} {Omega} cm was obtained under the Ar-to-O{sub 2} partial pressure ratio of 100:4. A relatively strong UV emission at {approx}3.26 eV was observed in the room-temperature photoluminescence spectrum. X-ray photoelectron spectroscopy analysis confirmed that Al was introduced into ZnO and substitutes for Zn and doped the film n-type.

  3. Photoinduced Br Desorption from CsBr Thin Films Grown on Cu(100)

    SciTech Connect

    Halliday, Matthew T.; Joly, Alan G.; Hess, Wayne P.; Shluger, AL

    2015-10-22

    Thin films of CsBr deposited onto metals such as copper are potential photocathode materials for light sources and other applications. We investigate desorption dynamics of Br atoms from CsBr films grown on insulator (KBr, LiF) and metal (Cu) substrates induced by sub-bandgap 6.4 eV laser pulses. The experimental results demonstrate that the peak kinetic energy of Br atoms desorbed from CsBr/Cu films is much lower than that for the hyperthermal desorption from CsBr/LiF films. Kelvin probe measurements indicate negative charge at the surface following Br desorption from CsBr/Cu films. Our ab initio calculations of excitons at CsBr surfaces demonstrate that this behavior can be explained by an exciton model of desorption including electron trapping at the CsBr surface. Trapped negative charges reduce the energy of surface excitons available for Br desorption. We examine the electron-trapping characteristics of low-coordinated sites at the surface, in particular, divacancies and kink sites. We also provide a model of cation desorption caused by Franck-Hertz excitation of F centers at the surface in the course of irradiation of CsBr/Cu films. These results provide new insights into the mechanisms of photoinduced structural evolution of alkali halide films on metal substrates and activation of metal photocathodes coated with CsBr.

  4. Surface cleaning procedures for thin films of indium gallium nitride grown on sapphire

    NASA Astrophysics Data System (ADS)

    Douglass, K.; Hunt, S.; Teplyakov, A.; Opila, R. L.

    2010-12-01

    Surface preparation procedures for indium gallium nitride (InGaN) thin films were analyzed for their effectiveness for carbon and oxide removal as well as for the resulting surface roughness. Aqua regia (3:1 mixture of concentrated hydrochloric acid and concentrated nitric acid, AR), hydrofluoric acid (HF), hydrochloric acid (HCl), piranha solution (1:1 mixture of sulfuric acid and 30% H 2O 2) and 1:9 ammonium sulfide:tert-butanol were all used along with high temperature anneals to remove surface contamination. X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) were utilized to study the extent of surface contamination and surface roughness, respectively. The ammonium sulfide treatment provided the best overall removal of oxygen and carbon. Annealing over 700 °C after a treatment showed an even further improvement in surface contamination removal. The piranha treatment resulted in the lowest residual carbon, while the ammonium sulfide treatment leads to the lowest residual oxygen. AFM data showed that all the treatments decreased the surface roughness (with respect to as-grown specimens) with HCl, HF, (NH 4) 2S and RCA procedures giving the best RMS values (˜0.5-0.8 nm).

  5. Dynamics of surface evolution in semiconductor thin films grown from a chemical bath.

    PubMed

    Gupta, Indu; Mohanty, Bhaskar Chandra

    2016-01-01

    Dynamics of surface evolution in CdS thin films grown by chemical bath deposition technique has been studied from time sequence of atomic force micrographs. Detailed scaling analysis of surface fluctuation in real and Fourier space yielded characteristic exponents αloc = 0.78 ± 0.07, α = 2.20 ± 0.08, αs = 1.49 ± 0.22, β = 0.86 ± 0.05 and βloc = 0.43 ± 0.10, which are very different from those predicted by the local growth models and are not related to any known universality classes. The observed anomalous scaling pattern, characterized by power law scaling dependence of interface width on deposition time differently at local and global scale, with rapid roughening of the growth front has been discussed to arise as a consequence of a nonlocal effect in the form of diffusional instability. PMID:27615367

  6. Dysprosium oxide and dysprosium-oxide-doped titanium oxide thin films grown by atomic layer deposition

    SciTech Connect

    Tamm, Aile Kozlova, Jekaterina; Aarik, Lauri; Aarik, Jaan; Kukli, Kaupo; Link, Joosep; Stern, Raivo

    2015-01-15

    Dysprosium oxide and dysprosium-oxide-doped titanium oxide thin films were grown by atomic layer deposition on silicon substrates. For depositing dysprosium and titanium oxides Dy(thd){sub 3}-O{sub 3} and TiCl{sub 4}-O{sub 3} were used as precursors combinations. Appropriate parameters for Dy(thd){sub 3}-O{sub 3} growth process were obtained by using a quartz crystal microbalance system. The Dy{sub 2}O{sub 3} films were deposited on planar substrates and on three-dimensional substrates with aspect ratio 1:20. The Dy/Ti ratio of Dy{sub 2}O{sub 3}-doped TiO{sub 2} films deposited on a planar silicon substrate ranged from 0.04 to 0.06. Magnetometry studies revealed that saturation of magnetization could not be observed in planar Dy{sub 2}O{sub 3} films, but it was observable in Dy{sub 2}O{sub 3} films on 3D substrates and in doped TiO{sub 2} films with a Dy/Ti atomic ratio of 0.06. The latter films exhibited saturation magnetization 10{sup −6} A cm{sup 2} and coercivity 11 kA/m at room temperature.

  7. P-doped strontium titanate grown using two target pulsed laser deposition for thin film solar cells

    NASA Astrophysics Data System (ADS)

    Man, Hamdi

    Thin-film solar cells made of Mg-doped SrTiO3 p-type absorbers are promising candidates for clean energy generation. This material shows p-type conductivity and also demonstrates reasonable absorption of light. In addition, p-type SrTiO3 can be deposited as thin films so that the cost can be lower than the competing methods. In this work, Mg-doped SrTiO3 (STO) thin-films were synthesized and analyzed in order to observe their potential to be employed as the base semiconductor in photovoltaic applications. Mg-doped STO thin-films were grown by using pulsed laser deposition (PLD) using a frequency quadrupled Yttrium Aluminum Garnet (YAG) laser and with a substrate that was heated by back surface absorption of infrared (IR) laser light. The samples were characterized using X-ray photoelectron spectroscopy (XPS) and it was observed that Mg atoms were doped successfully in the stoichiometry. Reflection high energy electron diffraction (RHEED) spectroscopy proved that the thin films were polycrystalline. Kelvin Probe work function measurements indicated that the work function of the films were 4.167 eV after annealing. UV/Vis Reflection spectroscopy showed that Mg-doped STO thin-films do not reflect significantly except in the ultraviolet region of the spectrum where the reflection percentage increased up to 80%. Self-doped STO thin-films, Indium Tin Oxide (ITO) thin films and stainless steel foil (SSF) were studied in order to observe their characteristics before employing them in Mg-doped STO based solar cells. Self-doped STO thin films were grown using PLD and the results showed that they are capable of serving as the n-type semiconductor in solar cell applications with oxygen vacancies in their structure and low reflectivity. Indium Tin Oxide thin-films grown by PLD system showed low 25-50 ?/square sheet resistance and very low reflection features. Finally, commercially available stainless steel foil substrates were excellent substrates for the inexpensive growth of

  8. Surface structure determinations of crystalline ionic thin films grown on transition metal single crystal surfaces by low energy electron diffraction

    SciTech Connect

    Roberts, J.G.

    2000-05-01

    The surface structures of NaCl(100), LiF(100) and alpha-MgCl2(0001) adsorbed on various metal single crystals have been determined by low energy electron diffraction (LEED). Thin films of these salts were grown on metal substrates by exposing the heated metal surface to a molecular flux of salt emitted from a Knudsen cell. This method of investigating thin films of insulators (ionic salts) on a conducting substrate (metal) circumvents surface charging problems that plagued bulk studies, thereby allowing the use of electron-based techniques to characterize the surface.

  9. Diamond thin films grown by microwave plasma assisted chemical vapor deposition

    SciTech Connect

    Leksono, M.

    1991-09-05

    Undoped and boron doped diamond thin films have been successfully grown by microwave plasma chemical vapor deposition from CH{sub 4}, H{sub 2}, and B{sub 2}H{sub 6}. The films were characterized using x- ray diffraction techniques, Raman and infrared spectroscopies, scanning electron microscopy, secondary ion mass spectrometry, and various electrical measurements. The deposition rates of the diamond films were found to increase with the CH{sub 4} concentration, substrate temperature, and/or pressure, and at 1.0% methane, 900{degrees}C, and 35 Torr, the value was measured to be 0.87 {mu}m/hour. The deposition rate for boron doped diamond films, decreases as the diborane concentration increases. The morphologies of the undoped diamond films are strongly related to the deposition parameters. As the temperature increases from 840 to 925 C, the film morphology changes from cubo-octahedron to cubic structures, while as the CH{sub 4} concentration increases from 0.5 to 1.0%, the morphology changes from triangular (111) faces with a weak preferred orientation to square (100) faces. At 2.0% Ch{sub 4} or higher the films become microcrystalline with cauliflower structures. Scanning electron microscopy analyses also demonstrate that selective deposition of undoped diamond films has been successfully achieved using a lift-off process with a resolution of at least 2 {mu}m. The x-ray diffraction and Raman spectra demonstrate that high quality diamond films have been achieved. The concentration of the nondiamond phases in the films grown at 1.0% CH{sub 4} can be estimated from the Raman spectra to be at less than 0.2% and increases with the CH{sub 4} concentration. The Raman spectra of the boron doped diamond films also indicate that the presence of boron tends to suppress the nondiamond phases in the films. Infrared spectra of the undoped diamond films show very weak CH stretch peaks which suggest that the hydrogen concentration is very low.

  10. Ultrafast structural dynamics of LaVO3 thin films grown by hybrid molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Brahlek, Matthew; Lapano, Jason; Stoica, Vladimir; Zhang, Lei; Zhang, Hai-Tian; Akamatsu, Hirofumi; Eaton, Craig; Gopalan, Venkatraman; Freeland, John; Wen, Haidan; Engel-Herbert, Roman

    LaVO3, with a partially full d-shell is expected to be metallic, but due to electron-electron interactions a gap emerges and the ground state is a Mott insulator. Such effects are a strong function of the bonding geometry, and particularly the V-O-V bond angle. Controlling these structural effects on the ultrafast time scale can lead to control over the underlying electronic ground state. Here we report the ultrafast structural dynamics of 25 and 50 nm thick LaVO3 thin films grown by the hybrid molecular beam epitaxy technique on SrTiO3 when excited across the bandgap by 800 nm light. Using time-resolved x-ray diffraction on the 100 ps time scale at Sector 7 of the Advanced Photon Source, we directly measured the structural changes with atomic accuracy by monitoring integer Bragg diffraction peaks and find a large out-of-plane strain of 0.18% upon optical excitation; the recovery time is ~1 ns for the 25 nm film and ~2 ns for the 50 nm film, consistent with the thermal transport from the film to the substrate. Further, we will discuss the response of the oxygen octahedral rotation patterns indicated by changes of the half-order diffraction peaks. Understanding such ultrafast structural deformation is important for optimizing optical excitations to create new metastable phases starting from a Mott insulator. This work was supported by the Department of Energy under Grant DE-SC0012375, and DE-AC02-06CH11357.

  11. A comparative study of physico-chemical properties of CBD and SILAR grown ZnO thin films

    SciTech Connect

    Jambure, S.B.; Patil, S.J.; Deshpande, A.R.; Lokhande, C.D.

    2014-01-01

    Graphical abstract: Schematic model indicating ZnO nanorods by CBD (Z{sub 1}) and nanograins by SILAR (Z{sub 2}). - Highlights: • Simple methods for the synthesis of ZnO thin films. • Comparative study of physico-chemical properties of ZnO thin films prepared by CBD and SILAR methods. • CBD outperforms SILAR method. - Abstract: In the present work, nanocrystalline zinc oxide (ZnO) thin films have been successfully deposited onto glass substrates by simple and economical chemical bath deposition (CBD) and successive ionic layer adsorption reaction (SILAR) methods. These films were further characterized for their structural, optical, surface morphological and wettability properties. The X-ray diffraction (XRD) patterns for both CBD and SILAR deposited ZnO thin films reveal the highly crystalline hexagonal wurtzite structure. From optical studies, band gaps obtained are 2.9 and 3.0 eV for CBD and SILAR deposited thin films, respectively. The scanning electron microscope (SEM) patterns show growth of well defined randomly oriented nanorods and nanograins on the CBD and SILAR deposited samples, respectively. The resistivity of CBD deposited films (10{sup 2} Ω cm) is lower than that of SILAR deposited films (10{sup 5} Ω cm). Surface wettability studies show hydrophobic nature for both films. From the above results it can be concluded that CBD grown ZnO thin films show better properties as compared to SILAR method.

  12. Defect-free thin InAs nanowires grown using molecular beam epitaxy.

    PubMed

    Zhang, Zhi; Chen, Ping-Ping; Lu, Wei; Zou, Jin

    2016-01-21

    In this study, we designed a simple method to achieve the growth of defect-free thin InAs nanowires with a lateral dimension well below their Bohr radius on different substrate orientations. By depositing and annealing a thin layer of Au thin film on a (100) substrate surface, we have achieved the growth of defect-free uniform-sized thin InAs nanowires. This study provides a strategy to achieve the growth of pure defect-free thin nanowires. PMID:26671780

  13. Nucleation and stochiometry dependence of rutile-TiO2 thin films grown by plasma-assisted molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Constantin, Costel; Sun, Kai; Feenstra, R. M.

    2008-03-01

    Considerable interest has been shown of late in transition-metal oxides. One case is the titanium dioxide system, which can have applications as a high-k dielectric gate insulator for Si-based devicesootnotetextZ. J. Luo et al., Appl. Phys. Lett. 79, 2803. In this study, rutile-TiO2 thin films were grown on GaN(0001) substrates by oxygen plasma-assisted molecular beam epitaxy. Two sets of films were grown, one in which the initial GaN surface is prepared WITH the pseudo 1x1 Ga-rich surface reconstruction, and the other set, WITHOUT the pseudo 1x1. On top of these two type of surfaces, the rutile-TiO2 thin films were grown at Ts˜ 600 ^oC, and with a thickness ˜ 40 - 50 nm. During growth, reflection high-energy electron diffraction indicated a reversible stoichiometry transition from O-rich to Ti-rich growth. Post-growth x-ray diffraction measurements performed on the samples WITHOUT the GaN pseudo 1x1, show the presence of additional peaks at 2θ = 52.9^o, which implies the existence of additional phases. In addition, the high-resolution transmission electron microscopy performed on these samples show a high degree of disorder, as compared to the samples prepared WITH the pseudo 1x1. Work supported by ONR.

  14. Titanium Isopropoxide Precursor Volume Consumption as a Function of Temperature for Titanium Dioxide Thin Films Grown by Atomic Layer Deposition

    NASA Astrophysics Data System (ADS)

    Constantin, Costel

    2012-02-01

    Atomic layer deposition (ALD) offers tremendous opportunities for controlling material synthesis on an atomic level and for creating nanolayers with unique new functionalities. ALD is a chemical gas phase thin film deposition method based on alternating surface reactions that employs two or more precursors. ALD is often used for growth of high k dielectric constant oxide films. Titanium dioxide material have a k value of 80, and a band gap of ˜ 3 eV, and due to strong oxidizing properties thin films coated on construction materials and glass have fog proof, and self cleaning properties. Our ALD reactor employs liquid Titanium Isopropoxide [TiOCH(CH3)24] as a metal precursor and distilled H2O as an oxygen source to grow thin films of titanium dioxide [TiO2] on silicon [Si], gallium nitride [GaN], and Aluminium foil [Al-foil] substrates. Titanium Isopropoxide exhibit a vapor pressure surge above 40^o C and we report the volume precursor consumption as a function of precursor temperature and thin film thickness for ALD grown TiO2 on Si, GaN, and Al-foil substrates. We will also present dielectric constants of the TiO2 thin films measured with a variable angle spectroscopic ellipsometer.

  15. Structure disorder degree of polysilicon thin films grown by different processing: Constant C from Raman spectroscopy

    SciTech Connect

    Wang, Quan; Zhang, Yanmin; Hu, Ran; Ren, Naifei; Ge, Daohan

    2013-11-14

    Flat, low-stress, boron-doped polysilicon thin films were prepared on single crystalline silicon substrates by low pressure chemical vapor deposition. It was found that the polysilicon films with different deposition processing have different microstructure properties. The confinement effect, tensile stresses, defects, and the Fano effect all have a great influence on the line shape of Raman scattering peak. But the effect results are different. The microstructure and the surface layer are two important mechanisms dominating the internal stress in three types of polysilicon thin films. For low-stress polysilicon thin film, the tensile stresses are mainly due to the change of microstructure after thermal annealing. But the tensile stresses in flat polysilicon thin film are induced by the silicon carbide layer at surface. After the thin film doped with boron atoms, the phenomenon of the tensile stresses increasing can be explained by the change of microstructure and the increase in the content of silicon carbide. We also investigated the disorder degree states for three polysilicon thin films by analyzing a constant C. It was found that the disorder degree of low-stress polysilicon thin film larger than that of flat and boron-doped polysilicon thin films due to the phase transformation after annealing. After the flat polysilicon thin film doped with boron atoms, there is no obvious change in the disorder degree and the disorder degree in some regions even decreases.

  16. X-ray Investigation of Ferromagnetic MnAs Thin Films Grown on GaAs(001) by MBE

    NASA Astrophysics Data System (ADS)

    Huang, S.; Ming, Z. H.; Soo, Y. L.; Kao, Y. H.; Tanaka, M.; Munekata, H.

    1996-03-01

    Quantitative characterization of the microstructures in epitaxial layers grown by MBE is essential for understanding the dynamical processes of epitaxy and surface morphology. In the present study, various x-ray techniques including grazing incidence x-ray scattering (GIXS), x-ray diffraction (XRD), and extended x-ray absorption fine structure (EXAFS) have been employed to investigate the microstructures of two MnAs thin films grown on GaAs(001) by using two different growth templates. The film structures are compared in terms of the interfacial roughness, lattice constants, epilayer thickness, local environment surrounding the Mn atoms, coordination number, and local disorder. These results provide quantitative evidence for the effects of template on the local structure and crystallinity of the MnAs films which can be correlated with the observed difference in their physical properties such as the easy magnetization direction, etc.. * Research is supported in part by DOE.

  17. As-grown Y-Ba-Cu-O thin films by reactive coevaporation with oxygen plasma cooling

    NASA Astrophysics Data System (ADS)

    Matsumoto, M.; Akoh, H.; Takada, S.

    1989-10-01

    We have developed a new fabrication process of as-grown Y-Ba-Cu-O thin films using a reactive coevaporation method specially with the rf-plasma cooling in the low oxygen pressure of 0.4 mTorr. By this O2 plasma cooling process, the transition temperature Tc is improved from 40 to 81 K for the film with a thickness of 1000 Å. The x-ray diffraction analysis shows that the activated oxygen species generated by the rf plasma make Y-Ba-Cu-O films oxidize sufficiently even in the low pressure of oxygen. In addition, we have studied the thickness dependence of Tc for as-grown films with various thicknesses of 60-2000 Å.

  18. As-grown Y-Ba-Cu-O thin films by reactive coevaporation with oxygen plasma cooling

    SciTech Connect

    Matsumoto, M.; Akoh, H.; Takada, S. )

    1989-10-15

    We have developed a new fabrication process of as-grown Y-Ba-Cu-O thin films using a reactive coevaporation method specially with the rf-plasma cooling in the low oxygen pressure of 0.4 mTorr. By this O{sub 2} plasma cooling process, the transition temperature {ital T}{sub {ital c}} is improved from 40 to 81 K for the film with a thickness of 1000 A. The x-ray diffraction analysis shows that the activated oxygen species generated by the rf plasma make Y-Ba-Cu-O films oxidize sufficiently even in the low pressure of oxygen. In addition, we have studied the thickness dependence of {ital T}{sub {ital c}} for as-grown films with various thicknesses of 60--2000 A.

  19. Properties of CsI, CsBr and GaAs thin films grown by pulsed laser deposition

    SciTech Connect

    Brendel, V M; Garnov, S V; Yagafarov, T F; Iskhakova, L D; Ermakov, R P

    2014-09-30

    CsI, CsBr and GaAs thin films have been grown by pulsed laser deposition on glass substrates. The morphology and structure of the films have been studied using X-ray diffraction and scanning electron microscopy. The CsI and CsBr films were identical in stoichiometry to the respective targets and had a polycrystalline structure. Increasing the substrate temperature led to an increase in the density of the films. All the GaAs films differed in stoichiometry from the target. An explanation was proposed for this fact. The present results demonstrate that, when the congruent transport condition is not fulfilled, films identical in stoichiometry to targets can be grown by pulsed laser deposition in the case of materials with a low melting point and thermal conductivity. (interaction of laser radiation with matter)

  20. Enhanced Carrier Generation in Nb-Doped SnO2 Thin Films Grown on Strain-Inducing Substrates

    NASA Astrophysics Data System (ADS)

    Nakao, Shoichiro; Yamada, Naoomi; Hirose, Yasushi; Hasegawa, Tetsuya

    2012-06-01

    We report the effect of lattice strain from the substrate on carrier generation in Nb-doped SnO2 (NTO) transparent conductive oxide (TCO) thin films. The carrier activation efficiency of Nb was strongly affected by in-plane tensile strain, and the NTO films grown on c-Al2O3 and anatase TiO2 seed layers had carrier density (ne) as high as 3×1020 cm-3. In contrast, strain-free NTO films grown on glass exhibited much smaller ne due to the formation of deep impurity levels. These results imply that NTO has potential as a practical TCO in the presence of substrate-film epitaxial interaction.

  1. Structural and magnetic properties of epitaxial CrO2 thin films grown on TiO2 (001) substrates

    NASA Astrophysics Data System (ADS)

    Zhang, Xueyu; Zhong, Xing; Visscher, P. B.; LeClair, Patrick R.; Gupta, Arunava

    2013-04-01

    The structural and magnetic properties of epitaxial CrO2 thin films grown on (001)-oriented TiO2 substrates by atmospheric pressure chemical vapor deposition are investigated. Due to the competition between demagnetization and a relatively weak perpendicular magnetocrystalline anisotropy, the deposited CrO2 (001) films exhibit magnetic properties that are significantly different from CrO2 (100) and CrO2 (110) films grown on TiO2 substrates. Based on the thickness dependence of M-H curves, a surface anisotropy is confirmed to exist, likely originating from strain in the film. The out-of-plane hysteresis curves can be well described by a distribution of effective anisotropy that may be due to a varying local demagnetizing field and a distribution of strain across the film. For the in-plane magnetization, the hysteresis curves are consistent with stripe or vortex domain structures of an almost closed flux configuration at remanence.

  2. High-quality Bi{sub 2}Te{sub 3} thin films grown on mica substrates for potential optoelectronic applications

    SciTech Connect

    Wang, K.; Bao, L. H.; Liu Yanwen; Wang Weiyi; Xiu Faxian; Meyer, N.; Che, X. Y.; He, L.; Lang, M. R.; Wang, K. L.; Chen, Z. G.; Post, K.; Basov, D. N.; Zou, J.

    2013-07-15

    We report high-quality topological insulator Bi{sub 2}Te{sub 3} thin films grown on muscovite mica substrates by molecular beam epitaxy. The topographic and structural analysis revealed that the Bi{sub 2}Te{sub 3} thin films exhibited atomically smooth terraces over a large area and a high crystalline quality. Both weak antilocalization effect and quantum oscillations were observed in the magnetotransport of the relatively thin samples. A phase coherence length of 277 nm for a 6 nm thin film and a high surface mobility of 0.58 m{sup 2} V{sup -1} s{sup -1} for a 4 nm thin film were achieved. These results confirm that the thin films grown on mica are of high quality.

  3. Magnetic properties of MnAs thin films grown on GaAs (0 0 1) by MOVPE

    NASA Astrophysics Data System (ADS)

    Sterbinsky, G. E.; May, S. J.; Chiu, P. T.; Wessels, B. W.

    2007-01-01

    The thickness dependence of the in-plane uniaxial anisotropy and coercive field of epitaxial MnAs thin films on GaAs (0 0 1) substrates has been determined from the magneto-optic Kerr effect. The metalorganic vapor phase epitaxy grown films are single α phase at room temperature with a B-type variant orientation. The coercive field of these films increases to a maximum for a film 35 nm thick and then decreases in thicker films. An increase in magnetic anisotropy field with increasing thickness is observed and is attributed to an increasing volume contribution to the anisotropy constant.

  4. Improving stability of photoluminescence of ZnSe thin films grown by molecular beam epitaxy by incorporating Cl dopant

    NASA Astrophysics Data System (ADS)

    Wang, J. S.; Chen, W. J.; Yang, C. S.; Tsai, Y. H.; Wang, H. H.; Chen, R. H.; Shen, J. L.; Tsai, C. D.

    2011-01-01

    This investigation studies the effect of chlorine (Cl) dopant in ZnSe thin films that were grown by molecular beam epitaxy on their photoluminescence (PL) and the stability thereof. Free excitonic emission was observed at room-temperature in the Cl-doped sample. Photon irradiation with a wavelength of 404 nm and a power density of 9.1 W/cm2 has a much stronger effect on PL degradation than does thermal heating to a temperature of 150 °C. Additionally, this study shows that the generation of nonradiative centers by both photon irradiation and thermal heating can be greatly inhibited by incorporating Cl dopant.

  5. Strain effects in epitaxial Mn{sub 2}O{sub 3} thin film grown on MgO(100)

    SciTech Connect

    Dang Duc Dung; Duong Van Thiet; Duong Anh Tuan; Cho, Sunglae

    2013-05-07

    We report on the epitaxial growth and magnetic properties of Mn{sub 2}O{sub 3} thin films grown on MgO(001) substrate by molecular beam epitaxy. We observed the reduction in binding energy of Mn valence states, the increase in satellite separation up to 12.7 eV, and the smaller band gap of 3.32 eV. In addition, the antiferromagnetic ordering below 90 K in bulk changed to ferrimagnetic up to 175 K. The results were possibly to be explained by a lattice mismatch strain on Mn{sub 2}O{sub 3} film on MgO(001) substrate.

  6. Wet chemically grown composite thin film for room temperature LPG sensor

    NASA Astrophysics Data System (ADS)

    Birajadar, Ravikiran; Desale, Dipalee; Shaikh, Shaheed; Mahajan, Sandip; Upadhye, Deepak; Ghule, Anil; Sharma, Ramphal

    2014-04-01

    We have synthesized thin film of zinc oxide-polyaniline (ZnO/PANI) composite using a simple wet chemical approach. As-synthesized ZnO/PANI composite thin film studied using different characterization techniques. The optical study reveals the penetration and interaction of PANI molecules with ZnO thin film. Prominent blue shift in UV-vis due to interaction between ZnO and PANI indicate presence of zinc oxide in polyaniline matrix. It is observed that ZnO thin film is not sensitive to LPG (liquefied petroleum gas) at room temperature. On the other hand ZnO/PANI composite thin film shows good response and recovery behaviors at room temperature.

  7. Superconducting YBa 2Cu 3O 7- δ thin film grown on metallic film evaporated on MgO

    NASA Astrophysics Data System (ADS)

    Verdyan, A.; Azoulay, J.; Lapsker, I.

    2001-03-01

    At present it is commonly accepted that thin film formation of YBa 2Cu 3O 7- δ (YBCO) on conducting substrate is one of the keys to further development of advanced devices in the microelectronic and other applications. We have grown YBCO thin films by resistive evaporation technique on MgO coated with metallic layers (Ni or Ag). A simple inexpensive vacuum system equipped with resistively heated boats for metal and precursor mixture of yttrium, copper and barium fluoride powders was used. X-ray diffraction (XRD) and scanning electron microscopy techniques were used for texture, morphology and surface analyses respectively. Electrical and magnetical properties were determined by a standard dc four-probe method. The way of heating process is shown to be critical parameter in the film quality. The physical and electrical properties of the YBCO films are discussed in light of the fact that XRD measurements done on the metallic buffer layers have revealed a multicrystalline structure.

  8. Effect of annealing on the properties of zinc oxide nanofiber thin films grown by spray pyrolysis technique

    NASA Astrophysics Data System (ADS)

    Sadananda Kumar, N.; Bangera, Kasturi V.; Shivakumar, G. K.

    2013-01-01

    Zinc oxide nanofiber thin films have been deposited on glass substrate by spray pyrolysis technique. The X-ray diffraction studies revealed that the films are polycrystalline with the hexagonal structure and a preferred orientation along (002) direction for films annealed for 1 h at 450 °C. Further increase in annealing time changes the preferred orientation to (100) direction. The scanning electron microscopic analysis showed the formation of ZnO nanofiber with an average diameter of approximately 800 nm for annealed films. The compositional analysis of nanofiber ZnO thin films were studied by time of flight secondary ion mass spectroscopy, which indicated oxygen deficiency in the films. The optical properties of annealed films have shown a variation in the band gap between 3.29 and 3.20 eV. The electrical conductivity of the as grown and annealed films showed an increase in the conductivity by two orders of magnitude with increase in annealing duration.

  9. Unconventional magnetization of Fe3O4 thin film grown on amorphous SiO2 substrate

    NASA Astrophysics Data System (ADS)

    Yin, Jia-Xin; Liu, Zhi-Guo; Wu, Shang-Fei; Wang, Wen-Hong; Kong, Wan-Dong; Richard, Pierre; Yan, Lei; Ding, Hong

    2016-06-01

    High quality single crystal Fe3O4 thin films with (111) orientation had been prepared on amorphous SiO2 substrate by pulsed laser deposition. The magnetization properties of the films are found to be unconventional. The Verwey transition temperature derived from the magnetization jump is around 140K, which is higher than the bulk value and it can be slightly suppressed by out-plane magnetic field; the out-of-plane magnetization, which is unexpectedly higher than the in-plane value, is also significantly increased as compared with the bulk value. Our findings highlight the unusual magnetization of Fe3O4 thin film grown on the amorphous SiO2 substrate.

  10. Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

    NASA Astrophysics Data System (ADS)

    Hojabri, Alireza

    2016-09-01

    Zirconium oxide thin films were grown successfully by thermal annealing of zirconium thin films deposited on quartz and silicon substrates by direct current magnetron sputtering technique. The structural and optical properties in relation to thermal annealing times were investigated. The X-ray diffraction patterns revealed that structure of films changes from amorphous to crystalline by increase of annealing times in range 60-240 min. The composition of films was determined by Rutherford back scattering spectroscopy. Atomic force microscopy results exhibited that surface morphology and roughness of films depend on the annealing time. The refractive index of the films was calculated using Swanepoel's method. The optical band gap energy of annealed films decreased from 5.50 to 5.34 eV with increasing thermal annealing time.

  11. Electric fatigue in Pb(Nb,Zr,Sn,Ti)O3 thin films grown by a sol-gel process

    NASA Astrophysics Data System (ADS)

    Zhai, Jiwei; Chen, Haydn

    2003-08-01

    Antiferroelectric Pb(Nb,Zr,Sn,Ti)O3 (PNZST) thin films were deposited via a sol-gel process on LaNiO3-buffered Pt/Ti/SiO2/Si substrates. The highly (100)-oriented LaNiO3 buffer layer facilitated the formation of high-quality PNZST films with a strong (100) preferred orientation. These films showed improved electric fatigue properties than those grown on Pt/Ti/SiO2/Si substrates. With increasing cycling field, the remanent polarization increases but the saturated polarization decreases. Fatigue properties of PNZST antiferroelectric thin films might be closely related to the nonuniform strain buildup due to switching that tends to stabilize the ferroelectric phase.

  12. Co2FeAl Heusler thin films grown on Si and MgO substrates: Annealing temperature effect

    NASA Astrophysics Data System (ADS)

    Belmeguenai, M.; Tuzcuoglu, H.; Gabor, M. S.; Petrisor, T.; Tiusan, C.; Zighem, F.; Chérif, S. M.; Moch, P.

    2014-01-01

    10 nm and 50 nm Co2FeAl (CFA) thin films have been deposited on MgO(001) and Si(001) substrates by magnetron sputtering and annealed at different temperatures. X-rays diffraction revealed polycrystalline or epitaxial growth (according to CFA(001)[110]//MgO(001)[100] epitaxial relation) for CFA films grown on a Si and on a MgO substrate, respectively. For these later, the chemical order varies from the A2 phase to the B2 phase when increasing the annealing temperature (Ta), while only the A2 disorder type has been observed for CFA grown on Si. Microstrip ferromagnetic resonance (MS-FMR) measurements revealed that the in-plane anisotropy results from the superposition of a uniaxial and a fourfold symmetry term for CFA grown on MgO substrates. This fourfold anisotropy, which disappears completely for samples grown on Si, is in accord with the crystal structure of the samples. The fourfold anisotropy field decreases when increasing Ta, while the uniaxial anisotropy field is nearly unaffected by Ta within the investigated range. The MS-FMR data also allow for concluding that the gyromagnetic factor remains constant and that the exchange stiffness constant increases with Ta. Finally, the FMR linewidth decreases when increasing Ta, due to the enhancement of the chemical order. We derive a very low intrinsic damping parameter (1.1×10-3 and 1.3×10-3 for films of 50 nm thickness annealed at 615 °C grown on MgO and on Si, respectively).

  13. Crystal structure of thin oxide films grown on Zr-Nb alloys studied by RHEED

    NASA Astrophysics Data System (ADS)

    Khatamian, D.; Lalonde, S. D.

    1997-05-01

    The highly surface sensitive reflection high energy electron diffraction (RHEED) technique was used to determine thecrystal structure of oxide films grown on Zr-Nb alloys in air up to 673 K. The results show that the oxide films grown on Zr-2.5 wt% Nb(α-Zr + β-Zr) have a mixture of nearly-cubic-tetragona and monoclinic structures for films of 200 nm thick or less and that the outer layers of films thicker than 800 nm only have the monoclinic crystal structure. However, oxide films grown on Zr-20 wt% Nb (β-Zr) have a stabilized nearly-cubic-tetragonal structure for all film thicknesses, studied here, up to 2100 nm.

  14. Pseudo capacitive performance of copper oxide thin films grown by RF sputtering

    SciTech Connect

    Reddy, B. Purusottam; Ganesh, K. Sivajee; Hussain, O. M.

    2015-06-24

    Thin films of Copper Oxide were prepared by radio frequency magnetron sputtering on steel substrates maintained at 250°C under different RF powers ranging from 150W to 250W by keeping the sputtering pressure at 5.7×10{sup −3} mbar and O{sub 2}:Ar ratio of 1:7. The influence of RF power on the pseudo capacitive performance of thin films was studied. The X-ray diffraction studies and Raman studies indicates that all the thin films exhibits CuO phase. The electrochemical studies was done by using three electrode configuration with platinum as reference electrode. From the cyclic voltammetry studies a high rate pseudocapacitance of 227 mFcm{sup −2} at 0.5 mVs{sup −1} and 77% of capacity retention after 1000 cycles was obtained for the CuO thin films prepared at an RF power of 220W.

  15. Post-annealing effects on ZnS thin films grown by using the CBD method

    NASA Astrophysics Data System (ADS)

    Ahn, Heejin; Um, Youngho

    2015-09-01

    Herein, the structural, morphological, and optical properties of zinc sulfide (ZnS) thin films deposited via the chemical bath deposition method are reported. These films were deposited on soda-lime glass (SLG) substrates by using ZnSO4, thiourea, and 25% ammonia at 90 °C. The effect of changing the annealing temperature from 100 °C to 300 °C on the properties of the ZnS thin films was investigated. X-ray diffraction (XRD) patterns showed that the ZnS thin film annealed at 100 °C had an amorphous structure; however, as the annealing temperature was increased, the crystalline quality of the thin film was enhanced. Moreover, transmission measurements showed that the optical transmittance was about 80% for wavelengths above 500 nm. The band gap energy (E g ) value of the film annealed at 300 °C was decreased to about 3.82 eV.

  16. Conductivity of Thin Films Based on Single-Walled Carbon Nanotubes Grown by Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Rybakov, M. S.; Kosobutsky, A. V.; Sevostyanov, O. G.; Russakov, D. M.; Lomakin, M. V.; Chirkova, I. M.; Shandakov, S. D.

    2015-03-01

    Electrical and optical properties of thin films of single-walled carbon nanotubes (SWCNT) obtained by aerosol chemical vapor deposition using ethanol, ferrocene, and sulfur are studied. Structural and geometrical characteristics of the synthesis products are determined by the methods of Raman spectroscopy and transmission electron microscopy. The effect of sulfur on the properties of the SWCNTs and thin films based on them is found.

  17. Optical, Electrical, and UV Photoresponse Properties of Fluorine-Doped ZnO Thin Films Grown on Flexible Mica Substrates

    NASA Astrophysics Data System (ADS)

    Kim, Younggyu; Leem, Jae-Young

    2015-12-01

    Fluorine-doped ZnO (FZO) thin films have several potential applications, for instance, in low-cost optoelectronic devices; understanding how their optical, electrical, and photoresponse properties depend on and can be controlled via the synthesis conditions is essential for application of these systems. In this study, FZO thin films with different annealing temperatures were grown on muscovite mica substrates via sol-gel spin-coating. In photoluminescence measurements, a strong peak in the ultraviolet (UV) region and a broad peak in the visible region were observed for all films, being strongly dependent on the annealing temperature. The transmittance of the annealed films was slightly higher than that of as-grown film, and the absorption edges in the transmittance spectra red-shifted with increasing annealing temperature. The optical bandgap and Urbach energy of the films were calculated from the absorption coefficient values, using the Tauc and Urbach relations, respectively. Finally, the electrical (i.e., resistivity and carrier concentration) and photoresponse properties of the films were investigated to assess their applicability for use in FZO-based UV detectors.

  18. KCl ultra-thin films with polar and non-polar surfaces grown on Si(111)7 × 7

    PubMed Central

    Beinik, Igor; Barth, Clemens; Hanbücken, Margrit; Masson, Laurence

    2015-01-01

    The growth of ultra-thin KCl films on the Si(111)7 × 7 reconstructed surface has been investigated as a function of KCl coverage and substrate temperature. The structure and morphology of the films were characterized by means of scanning tunneling microscopy (STM) under ultra-high vacuum (UHV) conditions. Detailed analysis of the atomically resolved STM images of islands grown at room and high temperatures (400 K–430 K) revealed the presence of KCl(001) and KCl(111) islands with the ratio between both structures depending on the growth temperature. At room temperature, the growth of the first layer, which covers the initial Si(111)7 × 7 surface, contains double/triple atomic layers of KCl(001) with a small fraction of KCl(111) islands. The high temperature growth promotes the appearance of large KCl(111) areas, which are built up by three atomic layers. At room and high temperatures, flat and atomically well-defined ultra-thin KCl films can be grown on the Si(111)7 × 7 substrate. The formation of the above mentioned (111) polar films is interpreted as a result of the thermally activated dissociative adsorption of KCl molecules on Si(111)7 × 7, which produces an excess of potassium on the Si surface. PMID:25650038

  19. Semiconductor-insulator transition in VO{sub 2} (B) thin films grown by pulsed laser deposition

    SciTech Connect

    Rúa, Armando; Díaz, Ramón D.; Lysenko, Sergiy; Fernández, Félix E.

    2015-09-28

    Thin films of B-phase VO{sub 2} were grown by pulsed-laser deposition on glass and (100)-cut MgO substrates in a temperature range from 375 to 425 °C and at higher gas pressures than usual for this technique. The films were strongly oriented, with ab-planes parallel to the substrate surface. Detailed study of surface morphology through Atomic Force Microscopy images suggest significant differences in evolution as a function of growth temperature for films on the two types of substrates. Measurements of electrical conductivities through cooling-heating cycles from room temperature to 120 K showed changes of five orders of magnitude, with steeper changes between room temperature and ∼150 K, which corresponds with the extended and reversible phase transition known to occur for this material. At lower temperatures conductivities exhibited Arrhenius behavior, indicating that no further structural change was occurring and that conduction is thermally activated. In this lower temperature range, conductivity of the samples can be described by the near-neighbor hopping model. No hysteresis was found between the cooling and heating braches of the cycles, which is at variance with previous results published for VO{sub 2} (B). This apparent lack of hysteresis for thin films grown in the manner described and the large conductivity variation as a function of temperature observed for the samples suggests this material could be of interest for infrared sensing applications.

  20. Room temperature ferromagnetism in epitaxial Cr{sub 2}O{sub 3} thin films grown on r-sapphire

    SciTech Connect

    Punugupati, Sandhyarani Narayan, Jagdish; Hunte, Frank

    2015-05-21

    We report on the epitaxial growth and magnetic properties of Cr{sub 2}O{sub 3} thin films grown on r-sapphire substrate using pulsed laser deposition. The X-ray diffraction (XRD) (2θ and Φ) and TEM characterization confirm that the films are grown epitaxially. The r-plane (011{sup ¯}2) of Cr{sub 2}O{sub 3} grows on r-plane of sapphire. The epitaxial relations can be written as [011{sup ¯}2] Cr{sub 2}O{sub 3} ‖ [011{sup ¯}2] Al{sub 2}O{sub 3} (out-of-plane) and [1{sup ¯}1{sup ¯}20] Cr{sub 2}O{sub 3} ‖ [1{sup ¯}1{sup ¯}20] Al{sub 2}O{sub 3} (in-plane). The as-deposited films showed ferromagnetic behavior up to 400 K but ferromagnetism almost vanishes with oxygen annealing. The Raman spectroscopy data together with strain measurements using high resolution XRD indicate that ferromagnetism in r-Cr{sub 2}O{sub 3} thin films is due to the strain caused by defects, such as oxygen vacancies.

  1. Characterization of ZnO thin films grown on different p-Si substrate elaborated by solgel spin-coating method

    SciTech Connect

    Chebil, W.; Fouzri, A.; Fargi, A.; Azeza, B.; Zaaboub, Z.; and others

    2015-10-15

    Highlights: • High quality ZnO thin films grown on different p-Si substrates were successful obtained by sol–gel process. • PL measurement revealed that ZnO thin film grown on porous Si has the better optical quality. • I–V characteristics for all heterojunctions exhibit successful diode formation. • The diode ZnO/PSi shows a better photovoltaic effect under illumination with a maximum {sub Voc} of 0.2 V. - Abstract: In this study, ZnO thin films are deposited by sol–gel technique on p-type crystalline silicon (Si) with [100] orientation, etched silicon and porous silicon. The structural analyses showed that the obtained thin films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented along the c-axis direction. Morphological study revealed the presence of rounded and facetted grains irregularly distributed on the surface of all samples. PL spectra at room temperature revealed that ZnO thin film grown on porous Si has a strong UV emission with low defects in the visible region comparing with ZnO grown on plat Si and etched Si surface. The heterojunction parameters were evaluated from the (I–V) under dark and illumination at room temperature. The ideality factor, barrier height and series resistance of heterojunction grown on different p-Si substrates are determined by using different methods. Best electrical properties are obtained for ZnO layer deposited on porous silicon.

  2. X-ray photoelectron spectroscopy study of the growth kinetics of biomimetically grown hydroxyapatite thin-film coatings

    NASA Astrophysics Data System (ADS)

    McLeod, K.; Kumar, S.; Dutta, N. K.; Smart, R. St. C.; Voelcker, N. H.; Anderson, G. I.

    2010-09-01

    Hydroxyapatite (HA) thin-film coatings grown biomimetically using simulated body fluid (SBF) are desirable for a range of applications such as improved fixation of fine- and complex-shaped orthopedic and dental implants, tissue engineering scaffolds and localized and sustained drug delivery. There is a dearth of knowledge on two key aspects of SBF-grown HA coatings: (i) the growth kinetics over short deposition periods, hours rather than weeks; and (ii) possible difference between the coatings deposited with and without periodic SBF replenishment. A study centred on these aspects is reported. X-ray photoelectron spectroscopy (XPS) has been used to study the growth kinetics of SBF-grown HA coatings for deposition periods ranging from 0.5 h to 21 days. The coatings were deposited with and without periodic replenishment of SBF. The XPS studies revealed that: (i) a continuous, stable HA coating fully covered the titanium substrate after a growth period of 13 h without SBF replenishment; (ii) thicker HA coatings about 1 μm in thickness resulted after a growth period of 21 days, both with and without SBF replenishment; and (iii) the Ca/P ratio at the surface of the HA coating was significantly lower than that in its bulk. No significant difference between HA grown with and without periodic replenishment of SBF was found. The coatings were determined to be carbonated, a characteristic desirable for improved implant fixation. The atomic force and scanning electron microscopies results suggested that heterogeneous nucleation and growth are the primary deposition mode for these coatings. Primary osteoblast cell studies demonstrated the biocompatibility of these coatings, i.e., osteoblast colony coverage of approximately 80%, similar to the control substrate (tissue culture polystyrene).

  3. Properties of SnS thin films grown by physical vapour deposition

    NASA Astrophysics Data System (ADS)

    Ganchev, M.; Vitanov, P.; Sendova-Vassileva, M.; Popkirov, G.; Dikov, H.

    2016-02-01

    Thin films of tin sulfide (SnS) were prepared by thermal evaporation technique on glass substrates and on n-type Si substrate and their physical properties were studied. The phase of the obtained thin films before and after thermal treatment was confirmed by X-ray diffraction analysis and Raman spectra. Optical transmission and reflection spectra were measured in the wavelength range 300-1800 nm, and the data were used to determine the direct and indirect optical band gaps. Four-point measurements have revealed that SnS thin film exhibits p-type conduction. Current-voltage characteristics of the SnS/ n-Si structures demonstrate strong photosensitivity and photovoltaic effect. However, in order to be able to evaluate the potential applicability of this heterojunction for photovoltaic or electronic devices, further study and technological optimization has to be conducted.

  4. Photonic bandgap amorphous chalcogenide thin films with multilayered structure grown by pulsed laser deposition method

    NASA Astrophysics Data System (ADS)

    Zhang, Shao-qian; Němec, Petre; Nazabal, Virginie; Jin, Yu-qi

    2016-05-01

    Amorphous chalcogenide thin films were fabricated by the pulsed laser deposition technique. Thereafter, the stacks of multilayered thin films for reflectors and microcavity were designed for telecommunication wavelength. The prepared multilayered thin films for reflectors show good compatibility. The microcavity structure consists of Ge25Ga5Sb10S65 (doped with Er3+) spacer layer surrounded by two 5-layer As40Se60/Ge25Sb5S70 reflectors. Scanning/transmission electron microscopy results show good periodicity, great adherence and smooth interfaces between the alternating dielectric layers, which confirms a suitable compatibility between different materials. The results demonstrate that the chalcogenides can be used for preparing vertical Bragg reflectors and microcavity with high quality.

  5. Structural and morphological properties of metallic thin films grown by pulsed laser deposition for photocathode application

    NASA Astrophysics Data System (ADS)

    Lorusso, A.; Gontad, F.; Caricato, A. P.; Chiadroni, E.; Broitman, E.; Perrone, A.

    2016-03-01

    In this work yttrium and lead thin films have been deposited by pulsed laser deposition technique and characterized by ex situ different diagnostic methods. All the films were adherent to the substrates and revealed a polycrystalline structure. Y films were uniform with a very low roughness and droplet density, while Pb thin films were characterized by a grain morphology with a relatively high roughness and droplet density. Such metallic materials are studied because they are proposed as a good alternative to copper and niobium photocathodes which are generally used in radiofrequency and superconducting radiofrequency guns, respectively. The photoemission performances of the photocathodes based on Y and Pb thin films have been also studied and discussed.

  6. Analysis of copper (I) oxide thin films grown in a photo-assisted chemical vapor deposition reactor for photovoltaic applications

    NASA Astrophysics Data System (ADS)

    Mohiuddin, Omar H.

    Copper (I) oxide (Cu2O) has enormous potenetial for photovoltaic applications. Cu2O is a p-type semiconductor with a direct band gap of 2.2 eV. When grown on silicon, thin film Cu2O has the potential to increase photovoltaic eciency. Cu2O is a suitable photovoltaic material because it is inexpensive, non-toxic and abundant in the earth's crust. A model was developed based on a stagnation flow reactor with a reduction in activation energy for the precursor decomposition due to the light irradiation to model the light irradiation. The parameters that were tested were substrate temperature (200 to 700° C), gas temperature (100 and 150 °C) and carrier gas flow rate (25 to 100 sccm). The model was tested with a 480 nm and 172 nm light irradiation source and without any light irradiation source. This thesis utilizes a photo assisted chemical vapor deposition reactor to deposit films of Cu2O on silicon. The films were grown with a surface temperature of 700 °C, a gas temperature of 150 °C and an oxygen gas flow rate of 100 sccm. One deposition was done without the use of any light irradiation and another deposition was done with a 480 nm light irradiation source. X-ray diffraction, ellipsometry and transmission electron microscopy (TEM) were used to investigate the light irradiation eect on the lm growth and morphology. When grown with light irradiation, the ellipsometer showed that the film thickness increased to 98 +/- 6 nm from 74 +/- 10 nm, which shows that there is greater uniformity with a higher thickness when grown with light irradiation. The XRD results showed an increase in crystallinity in Cu2O grown with light irradiation, and the TEM results showed the grain sizes double when grown with light irradiation. The UV irradiation has been shown to increase the copper (I) oxide film quality and lm thickness. The model showed that the effect of the light irradiation was maximized at a surface temperature of 400 °C After this temperature the thermal eects become

  7. Tunable magnetic anisotropy in permalloy thin films grown on holographic relief gratings

    NASA Astrophysics Data System (ADS)

    Berendt, J.; Teixeira, J. M.; García-García, A.; Raposo, M.; Ribeiro, P. A.; Dubowik, J.; Kakazei, G. N.; Schmool, D. S.

    2014-02-01

    The aim of the present work is to show a simple method that combines conventional laser interferometry and standard thin film deposition techniques to fabricate modulated magnetic nanostructures with lateral periodicity, and to tailor the magnetic properties by varying geometrical parameters. Well defined Ni80Fe20 magnetic thin films with sinusoidal grating profiles were obtained with a periodicity of 1.2 μm and different grating depths. Magnetic studies via ferromagnetic resonance and magneto optical Kerr effect demonstrate the tunability of the induced in-plane magnetic anisotropy with depth profile.

  8. Etching Technique to Reveal Dislocations in Thin GaAs Films Grown on Si Substrates

    NASA Astrophysics Data System (ADS)

    Nishikawa, Hironobu; Soga, Tetsuo; Mikuriya, Nobuo; Jimbo, Takashi; Umeno, Masayoshi

    1988-02-01

    Dislocations in GaAs and GaAs/Si are revealed by the etching technique at room temperature. The etchant is composed of H2O, K2Cr2O7, HNO3, HCl and H2SO4. The dislocation density of GaAs grown on Si by MOCVD using GaP and strained layer superlattices is about 1× 106 cm-2.

  9. Cu(In,Ga)Se 2 thin-film solar cells grown with cracked selenium

    NASA Astrophysics Data System (ADS)

    Kawamura, Masahiro; Fujita, Toshiyuki; Yamada, Akira; Konagai, Makoto

    2009-01-01

    Cu(In 1-xGa x)Se 2 (CIGS) films have been grown by using cracked selenium. In conventional evaporation system, the Se atoms were supplied as large clusters (Se x, x>5). However, the size of clusters can be reduced by the thermal cracking. The film qualities grown with small clusters (Se x, x<4) would be improved, since the smaller size molecules easily react with elemental metals, resulting in the reduction of selenium vacancies and the enhancement of surface migration. The CIGS films were deposited by the three-stage method with cracked selenium, and the films were evaluated by SEM, XRD, EDX, C- V measurement and admittance spectroscopy. It was found from the C- V characteristics that the carrier concentrations of the CIGS films grown with cracked selenium were increased with increasing the cracking temperature. The result clearly showed that the use of cracked selenium was effective for reduction of selenium vacancies. The conversion efficiency of 15.4% was obtained by using cracked selenium at a cracking temperature of 500 °C.

  10. Nanocolumnar interfaces and enhanced magnetic coercivity in preferentially oriented cobalt ferrite thin films grown using oblique-angle pulsed laser deposition.

    PubMed

    Mukherjee, Devajyoti; Hordagoda, Mahesh; Hyde, Robert; Bingham, Nicholas; Srikanth, Hariharan; Witanachchi, Sarath; Mukherjee, Pritish

    2013-08-14

    Highly textured cobalt ferrite (CFO) thin films were grown on Si (100) substrates using oblique-angle pulsed laser deposition (α-PLD). X-ray diffraction and in-depth strain analysis showed that the obliquely deposited CFO films had both enhanced orientation in the (111) crystal direction as well as tunable compressive strains as a function of the film thicknesses, in contrast to the almost strain-free polycrystalline CFO films grown using normal-incidence PLD under the same conditions. Using in situ optical plume diagnostics the growth parameters in the α-PLD process were optimized to achieve smoother film surfaces with roughness values as low as 1-2 nm as compared to the typical values of 10-12 nm in the normal-incidence PLD grown films. Cross-sectional high resolution transmission electron microscope images revealed nanocolumnar growth of single-crystals of CFO along the (111) crystallographic plane at the film-substrate interface. Magnetic measurements showed larger coercive fields (∼10 times) with similar saturation magnetization in the α-PLD-grown CFO thin films as compared to those deposited using normal-incidence PLD. Such significantly enhanced magnetic coercivity observed in CFO thin films make them ideally suited for magnetic data storage applications. A growth mechanism based on the atomic shadowing effect and strain compression-relaxation mechanism was proposed for the obliquely grown CFO thin films. PMID:23829642

  11. Local Structures and Interface Morphology of InGaAsN Thin Films Grown on GaAs

    SciTech Connect

    Allerman, A.A.; Chen, J.G.; Geisz, J.F.; Huang, S.; Hulbert, S.L.; Jones, E.D.; Kao, Y.H.; Kurtz, S.; Kurtz, S.R.; Olson, J.M.; Soo, Y.L.

    1999-02-23

    The compound semiconductor system InGaAsN exhibits many intriguing properties which are particularly useful for the development of innovative high efficiency thin film solar cells and long wavelength lasers. The bandgap in these semiconductors can be varied by controlling the content of N and In and the thin films can yet be lattice-matched to GaAs. In the present work, x-ray absorption fine structure (XAFS) and grazing incidence x-ray scattering (GIXS) techniques have been employed to probe the local environment surrounding both N and In atoms as well as the interface morphology of InGaAsN thin films epitaxially grown on GaAs. The soft x-ray XAFS results around nitrogen K-edge reveal that N is in the sp{sup 3} hybridized bonding configuration in InGaAsN and GaAsN, suggesting that N impurities most likely substitute for As sites in these two compounds. The results of In K-edge XAFS suggest a possible trend of a slightly larger coordination number of As nearest neighbors around In atoms in InGaAsN samples with a narrower bandgap whereas the In-As interatomic distance remains practically the same as in InAs within the experimental uncertainties. These results combined suggest that N-substitution of the As sites plays an important role of bandgap-narrowing while in the meantime counteracting the compressive strain caused by In-doping. Grazing incidence x-ray scattering (GIXS) experiments verify that InGaAsN thin films can indeed form very smooth interfaces with GaAs yielding an average interfacial roughness of 5-20{angstrom}.

  12. Dielectric anomaly in Li-doped zinc oxide thin films grown by sol gel route

    NASA Astrophysics Data System (ADS)

    Dhananjay; Singh, Satyendra; Nagaraju, J.; Krupanidhi, S. B.

    2007-08-01

    Sol gel route was employed to grow polycrystalline thin films of Li-doped ZnO thin films (Zn1-xLixO, x=0.15). Polycrystalline films were obtained at a growth temperature of 400 500 °C. Ferroelectricity in Zn0.85Li0.15O was verified by examining the temperature variation of the real and imaginary parts of dielectric constant, and from the C V measurements. The phase transition temperature was found to be 330 K. The room-temperature dielectric constant and dissipation factor were 15.5 and 0.09 respectively, at a frequency of 100 kHz. The films exhibited well-defined hysteresis loop, and the values of spontaneous polarization (Ps) and coercive field were 0.15 μC/cm2 and 20 kV/cm, respectively, confirming the presence of ferroelectricity.

  13. Study of optical and structural properties of CZTS thin films grown by co-evaporation and spray pyrolysis

    NASA Astrophysics Data System (ADS)

    Moreno, R.; Ramirez, E. A.; Gordillo Guzmán, G.

    2016-02-01

    Results regarding optical and structural properties of Cu2ZnSnS4 (CZTS) thin films prepared by co-evaporation using a novel procedure are compared with those obtained with CZTS films grown using a solution based route. The lattice strain ε and crystallite size D of CZTS films prepared by co-evaporation and by spray pyrolysis were estimated through X-ray diffraction (XRD) measurements using Williamson-Hall-isotropic strain model. The results of estimated average crystallite size of CZTS films by Scherrer and Williamson-Hall plot methods were compared with AFM (atomic force microscopy) measurements. It was found that the average crystallite size measured by Williamson-Hall plot methods agree quite well with AFM results. Further, information regarding the influence of preparation method on both, crystalline phases and the formation of structural defects was achieved through Raman and Urbach energy measurements.

  14. Studies of zinc-blende type MnAs thin films grown on InP(001) substrates by XRD

    NASA Astrophysics Data System (ADS)

    Oomae, H.; Irizawa, S.; Jinbo, Y.; Toyota, H.; Kambayashi, T.; Uchitomi, N.

    2013-09-01

    The detailed crystalline structure of molecular beam epitaxially grown MnAs thin films on InP(001) substrate has been investigated using high resolution X-ray diffraction techniques. Reciprocal space mapping of the MnAs/InP(001) samples indicates that the MnAs has a cubic zinc-blende (zb) structure with the epitaxial relationship zb-MnAs[110]|InP[110]. The lattice constant of zb-MnAs is ˜6.06 Å. The MnAs lattice is relaxed and is mosaic-like likely due to large lattice mismatch between the film and InP substrate. The isotropic nature of the magnetic properties supported our conjecture that the MnAs epitaxial film under study has indeed a cubic structure.

  15. Electrical property measurements of Cr-N codoped TiO2 epitaxial thin films grown by pulsed laser deposition

    SciTech Connect

    Jacimovic, J; Gaal, R; Magrez, Arnaud; Forro, Laszlo; Regmi, Murari; Eres, Gyula

    2013-01-01

    The temperature dependent resistivity and thermo-electric power of Cr-N codoped TiO2 were compared with that of single element N and Cr doped and undoped TiO2 using epitaxial anatase thin films grown by pulsed laser deposition on (100) LaAlO3 substrates. The resistivity plots and especially the thermoelectric power data confirm that codoping is not a simple sum of single element doping. However, the negative sign of the Seebeck coefficient indicates electron dominated transport independent of doping. The narrowing distinction among the effects of different doping methods combined with increasing resistivity of the films with improving crystalline quality of TiO2 suggest that structural defects play a critical role in the doping process.

  16. Correlation of Crystalline and Structural Properties of C60 Thin Films Grown at Various Temperature with Charge Carrier Mobility

    SciTech Connect

    Singh,T.; Sarciftci, N.; Yang, H.; Yang, L.; Plochberger, B.; Sitter, H.

    2007-01-01

    Transistors fabricated from C{sub 60} films grown by hot wall epitaxy at higher substrate temperature, showed an order of magnitude increased charge carrier mobility up to 6 cm{sup 2}/V s. In this letter, the authors present an extensive study of morphology and crystallinity of the fullerene films using atomic force microscopy and grazing-incidence x-ray diffraction. A clear correlation of crystalline quality of the C{sub 60} film and charge carrier mobility was found. A higher substrate temperature leads to a single crystal-like faceted fullerene crystals. The high crystalline quality solely brings a drastic improvement in the charge carrier mobility. A gate voltage independent mobility is also observed in these devices which can be attributed to the highly conjugated nature of the C{sub 60} thin film.

  17. Radiation tolerant GaAs MESFET with a highly-doped thin active layer grown by OMVPE

    SciTech Connect

    Nishiguchi, M.; Hashinaga, T.; Nishizawa, H.; Hayashi, H. ); Okazaki, N. ); Kitagawa, M.; Fujino, T. )

    1990-12-01

    A new structure of GaAs MESFET with high radiation tolerance is proposed. Changes in electrical parameters of a GaAs MESFET as a function of total {gamma}-ray dose have been found to be caused mainly by a decrease in the effective carrier concentration in an active layer. The authors have designed a new structure from a simulation based on an empirical relationship between the changes of the effective carrier concentration and the total {gamma}-ray dose. It has been successfully demonstrated by utilizing a highly-doped thin active layer (4 {times} 10{sup 18} cm{sup {minus}3}, 100 {Angstrom}) grown by OMVPE. This MESFET can withstand a dose ten times higher (1 {times} 10{sup 9} rads(GaAs)) than a conventional one can.

  18. Phase-coherent electron transport in (Zn, Al)O{sub x} thin films grown by atomic layer deposition

    SciTech Connect

    Saha, D. E-mail: pmisra@rrcat.gov.in; Misra, P. E-mail: pmisra@rrcat.gov.in; Ajimsha, R. S.; Joshi, M. P.; Kukreja, L. M.

    2014-11-24

    A clear signature of disorder induced quantum-interference phenomena leading to phase-coherent electron transport was observed in (Zn, Al)O{sub x} thin films grown by atomic layer deposition. The degree of static-disorder was tuned by varying the Al concentration through periodic incorporation of Al{sub 2}O{sub 3} sub-monolayer in ZnO. All the films showed small negative magnetoresistance due to magnetic field suppressed weak-localization effect. The temperature dependence of phase-coherence length (l{sub φ}∝T{sup −3/4}), as extracted from the magnetoresistance measurements, indicated electron-electron scattering as the dominant dephasing mechanism. The persistence of quantum-interference at relatively higher temperatures up to 200 K is promising for the realization of ZnO based phase-coherent electron transport devices.

  19. Synthesis of nanocrystalline Cu2ZnSnS4 thin films grown by the spray-pyrolysis technique

    NASA Astrophysics Data System (ADS)

    Chandel, Tarun; Singh, Joginder; Rajaram, P.

    2015-08-01

    Spray pyrolysis was used to deposit Cu2ZnSnS4 (CZTS) thin films on soda lime glass substrates at 300 °C. Aqueous solutions of copper chloride, zinc chloride, stannous chloride and thiourea were mixed together to form the spray liquid. The sprayed films were annealed under vacuum at 350 °C, 400 °C and 450 °C. Structural and optical characterization was performed on the CZTS films using X-ray diffraction (XRD) and UV-VIS spectrophotometry. XRD results indicate that the films are single phase nanocrystalline CZTS. Optical studies show that the optical gap values are 1.44 eV for the as-grown film and 1.46 eV, 1.48 eV and 1.49 eV for the films annealed at 350 °C, 400 °C and 450 °C, respectively.

  20. Highly effective and isotropic pinning in epitaxial Fe(Se,Te) thin films grown on CaF2 substrates

    NASA Astrophysics Data System (ADS)

    Braccini, V.; Kawale, S.; Reich, E.; Bellingeri, E.; Pellegrino, L.; Sala, A.; Putti, M.; Higashikawa, K.; Kiss, T.; Holzapfel, B.; Ferdeghini, C.

    2013-10-01

    We report on the isotropic pinning obtained in epitaxial Fe(Se,Te) thin films grown on CaF2(001) substrate. High critical current density values - larger than 1 MA/cm2 in self field and liquid helium - are reached together with a very weak dependence on the magnetic field and a complete isotropy. Analysis through transmission electron microscopy evidences the presence of defects looking like lattice disorder at a very small scale, between 5 and 20 nm, which are thought to be responsible for such isotropic behavior in contrast to what was observed on SrTiO3, where defects parallel to the c-axis enhance pinning in that direction.

  1. Paramagnetic dysprosium-doped zinc oxide thin films grown by pulsed-laser deposition

    SciTech Connect

    Lo, Fang-Yuh Ting, Yi-Chieh; Chou, Kai-Chieh; Hsieh, Tsung-Chun; Ye, Cin-Wei; Hsu, Yung-Yuan; Liu, Hsiang-Lin; Chern, Ming-Yau

    2015-06-07

    Dysprosium(Dy)-doped zinc oxide (Dy:ZnO) thin films were fabricated on c-oriented sapphire substrate by pulsed-laser deposition with doping concentration ranging from 1 to 10 at. %. X-ray diffraction (XRD), Raman-scattering, optical transmission spectroscopy, and spectroscopic ellipsometry revealed incorporation of Dy into ZnO host matrix without secondary phase. Solubility limit of Dy in ZnO under our deposition condition was between 5 and 10 at. % according to XRD and Raman-scattering characteristics. Optical transmission spectroscopy and spectroscopic ellipsometry also showed increase in both transmittance in ultraviolet regime and band gap of Dy:ZnO with increasing Dy density. Zinc vacancies and zinc interstitials were identified by photoluminescence spectroscopy as the defects accompanied with Dy incorporation. Magnetic investigations with a superconducting quantum interference device showed paramagnetism without long-range order for all Dy:ZnO thin films, and a hint of antiferromagnetic alignment of Dy impurities was observed at highest doping concentration—indicating the overall contribution of zinc vacancies and zinc interstitials to magnetic interaction was either neutral or toward antiferromagnetic. From our investigations, Dy:ZnO thin films could be useful for spin alignment and magneto-optical applications.

  2. Transport properties of Bi2Se3 thin films grown by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Wei, Z. T.; Zhang, M.; Yan, Y.; Kan, X.; Yu, Z.; Chen, Y. L.; Yang, X. S.; Zhao, Y.

    2015-11-01

    Epitaxial growth of Bi2Se3 thin films is of great current interest due to the advantages in spintronics and thermoelectrical applications. In this paper, Bi2Se3 thin films on Si (111) substrate have been prepared via magnetron sputtering deposition with post-annealing treatment and their microstructures and electrical transport properties were studied. Good quality with highly c-axis oriented films could be obtained after post-annealing treatment. The annealing temperature (Ta) obviously affected the phase structures and electrical properties. The crystallinity and the lattice parameters c of the Bi2Se3 thin-films increased with increasing Ta. The relative atomic ratio of Se/Bi decreased with increasing Ta and large number of Se vacancies was discovered in films with Ta = 350°C. The resistivity of films decreased monotonously and showed weakly metallic resistivity with the increase of Ta. Non-saturated high-field linear magnetoresistance and weak antilocalization were found in films with higher Ta.

  3. Nonlinear optical dynamics and Eu3+ spectral holeburning in strontium barium niobate thin film grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Liu, H.; Liu, G. K.; Li, S. T.; Beitz, J. V.; Fernandez, F. E.

    2002-01-01

    Optical quality SrxBa1-xNb2O6 (SBN) thin films, both undoped and Eu3+-doped, of thickness less than 0.5 μm have been successfully grown on fused quartz substrates using a pulsed laser deposition technique. Optical properties of these films were characterized in high-resolution spectroscopic experiments in time and frequency domains. For undoped SBN thin films, broadband emission in the UV region extending to the visible was observed following excitation at 355 nm. This emission is attributed to exciton luminescence of the SBN film. Nonlinear optical response in the picosecond regime and the third-order nonlinear susceptibility, χ(3), were studied using degenerate four-wave-mixing methods. In transverse alignment, χ(3) is enhanced by two orders of magnitude in comparison with its bulk counterpart. A thermal annealing process, monitored via changes in spectral properties of Eu3+, was employed to convert the as-grown amorphous film into a polycrystalline film. High-resolution spectroscopic measurements in the frequency domain were conducted on a 200-nm-thick film of Eu3+-doped SBN. Our spectroscopic results suggest that Eu3+ ions may substitute for Nb, thereby occupying a normally six-fold coordinated lattice site. At liquid helium temperature, spectral holes in the 7F0-5D0 optical transition were burned in the thermally annealed films. Typical observed hole widths were 70-100 MHz and hole depths were as large as 30% of the peak fluorescence intensity.

  4. Group III-nitride thin films grown using MBE and bismuth

    DOEpatents

    Kisielowski, Christian K.; Rubin, Michael

    2002-01-01

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  5. Group III-nitride thin films grown using MBE and bismuth

    DOEpatents

    Kisielowski, Christian K.; Rubin, Michael

    2000-01-01

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  6. Surface reconstructions and transport of epitaxial PtLuSb (001) thin films grown by MBE

    NASA Astrophysics Data System (ADS)

    Patel, Sahil J.; Logan, John A.; Harrington, Sean D.; Schultz, Brian D.; Palmstrøm, Chris J.

    2016-02-01

    This work presents the surface reconstructions and transport properties of the topological insulator PtLuSb grown on Al0.1In0.9Sb/GaAs (001). Two stable surface reconstructions, (1×3) and c(2×2), were observed on PtLuSb (001) surfaces. Antimony-dimerization was determined to be the nature of the (1×3) surface reconstruction as evidenced by chemical binding energy shifts in the antimony 4d core-level for surface bonding components. The two surface reconstructions were studied as a function of Sb4 overpressure and substrate temperature to create a reconstruction phase diagram. From this reconstruction phase diagram, a growth window from 320 °C to 380 °C using an antimony overpressure was identified. Within this window, the highest quality films were grown at a growth temperature of 380 °C. These films exhibited lower p-type carrier concentrations as well as relatively high hole mobilities.

  7. Comparative study of magnetite (Fe3O4) thin films grown by pulsed laser ablation and sputtering

    NASA Astrophysics Data System (ADS)

    Bohra, Murtaza; Varun Karthik Y., S.; Haveesh, G.; Tarun Y. S., N.; Prasad, D. V. B.; Chowdhury, D. Roy; Prasad, K. Eswar

    2016-05-01

    Comparative study of magnetite (Fe3O4) thin films grown by pulsed laser ablation (PLD) and radio frequency (RF)-sputtering of α-Fe2O3 target have been investigated. We have found strong correlation between RF power (P) of sputtering and substrate temperature (Ts) of PLD films on their structural and magnetic properties. Films grown at low P and Ts are dominated by antiferromagnetic α-Fe2O3 phase while ferrimagnetic Fe3O4 phase is dominant at high P and Ts Post-annealing in H2/H2O atmosphere at 450 °C, these films show single phase Fe3O4 but RF power and substrate temperature still play a significant role. With increasing P and Ts values, the orientation of Fe3O4 films change from (110) to (111) followed by complete randomizations. These (110) to (111) orientations affect magnetic properties differently above Verwey transition temperature of 120 K. The RF-power and substrate temperature have the same influence on the physical properties of Fe3O4 films, as both are related to thermal energy.

  8. In-situ superconducting YBa2Cu3O7 thin films grown by ion beam co-deposition

    NASA Astrophysics Data System (ADS)

    James, J. H.; Kellett, B. J.; Gauzzi, A.; Dwir, B.; Pavuna, D.

    1989-12-01

    We present superconducting YBa2C3O7 (YBCO) thin films grown in-situ by three-ion-beam sputtering. Y, Y2O3, Cu, Cu2O, BaF2 and BaCO3 sputter targets have been investigated. The highest quality films were prepared using a BaCO3 target. Auger analysis of films grown using a BaCO3 target show no carbon content. Y2O3 and Cu2O are more suitable than the native metals as sputter targets for YBCO growth as they are much less prone to sputter rate variations with oxygen partial pressure. They also supply oxygen to the growing film. As-deposited YBCO films are metallic (resistivity 240 μΩ cm at 100 K), reflective, and of highly homogeneous composition with TCO transition temperatures of 73 K and transition widths of 15 K. Post-annealing in flowing oxygen improves TCO's to 82 K. Critical currents are in excess of 105 A cm-2 at 77 K. Films are textured with c-axis orientation perpendicular to the (100) SrTiO3 substrate surface. As-deposited superconducting YBCO films have also been prepared on SiO2 and Y2O3 buffer layers on Si wafers.

  9. Enhanced ionic conduction at the film/substrate interface in LiI thin films grown on sapphire(0001)

    SciTech Connect

    Lubben, D.; Modine, F.A.

    1993-12-01

    The ionic conductivity of LiI thin films grown on sapphire(0001) substrates has been studied in-situ during deposition as a function of film thickness and deposition conditions. LiI films were produced at room temperature by sublimation in an ultra-high-vacuum system. The conductivity of the LiI parallel to the film/substrate interface was determined from frequency-dependent impedance measurements as a function of film thickness using Au interdigital electrodes deposited on the sapphire surface. The measurements show a conduction of {approximately}5 times the bulk value at the interface which gradually decreases as the film thickness is increased beyond 100 nm. This interfacial enhancement is not stable but anneals out with a characteristic log of time dependence. Fully annealed films have an activation energy for conduction ({sigma}T) of {approximately}0.47{plus_minus}.03 eV, consistent with bulk measurements. The observed annealing behavior can be fit with a model based on dislocation motion which implies that the increase in conduction near the interface is not due to the formation of a space-charge layer as previously reported but to defects generated during the growth process. This explanation is consistent with the behavior exhibited by CaF{sub 2} films grown under similar conditions.

  10. Thermal oxidation-grown vanadium dioxide thin films on FTO (Fluorine-doped tin oxide) substrates

    NASA Astrophysics Data System (ADS)

    Tong, Guoxiang; Li, Yi; Wang, Feng; Huang, Yize; Fang, Baoying; Wang, Xiaohua; Zhu, Huiqun; Li, Liu; Shen, Yujian; Zheng, Qiuxin; Liang, Qian; Yan, Meng; Qin, Yuan; Ding, Jie

    2013-11-01

    By deposition of metallic vanadium on FTO substrate in Argon atmosphere at room temperature, the sample was then annealed in furnace for 2 h at the temperature of 410 °C in air ambient. (1 1 0) -orientated vanadium dioxide films were prepared on the FTO surface. A maximum transmittance of ˜40% happened at 900-1250 nm region at room temperature. The change of optical transmittance at this region was ˜25% between semiconducting and metallic states. In particular, vanadium dioxide thin films on FTO exhibit semiconductor-metal phase transition at ˜51 °C, the width of the hysteresis loop is ˜8 °C.

  11. Investigation of thin films of organic-based magnets grown by physical vapor deposition

    SciTech Connect

    Kao, C. Y.; Lu, Y.; Li, B.; Yoo, J.-W.; Epstein, A. J.

    2014-10-06

    Thin films of organic-based magnet, V[TCNE]{sub x} (TCNE: tetracyanoethylene), were deposited by physical vapor deposition (PVD) based reactive evaporation. The growth conditions were studied in detail. A saturated composition of V[TCNE]{sub ∼1.9} was determined by optimizing the growth condition. Two sets of films with different V to TCNE ratios were characterized. Both films were magnetic ordered up to 400 K and held coercive field of 60 Oe at room temperature. With the presence of excess vanadium within the film, the increase of defects created by PVD results in significant change in electronic property.

  12. Photoresponse in thin films of WO{sub 3} grown by pulsed laser deposition

    SciTech Connect

    Roy Moulik, Samik; Samanta, Sudeshna; Ghosh, Barnali

    2014-06-09

    We report, the photoresponse behaviour of Tungsten trioxide (WO{sub 3}) films of different surface morphology, grown by using pulsed laser deposition (PLD). The Growth parameters for PLD were changed for two substrates SiO{sub 2}/Si (SO) and SrTiO{sub 3} (STO), such a way which, result nanocrystalline film on SO and needle like structured film on STO. The photoresponse is greatly modified in these two films because of two different surface morphologies. The nanocrystalline film (film on SO) shows distinct photocurrent (PC) ON/OFF states when light was turned on/off, the enhancement of PC is ∼27%. Whereas, the film with needle like structure (film on STO) exhibits significantly enhanced persistent photocurrent even in light off condition, in this case, the enhancement of PC ∼ 50% at room temperature at lowest wavelength (λ = 360 nm) at a nominal bias voltage of 0.1 V.

  13. Raman spectra of MOCVD-grown ferroelectric PbTiO{sub 3} thin films

    SciTech Connect

    Feng, Z.C.; Kwak, B.S. |; Erbil, A.; Boatner, L.A.

    1993-12-31

    Lead titanate (PbTiO{sub 3}) has been grown on a variety of substrates by using the metalorganic chemical vapor deposition (MOCVD) technique. The substrates employed included Si, GaAs, MgO, fused-quartz, sapphire, and KTaO{sub 3}. Raman spectra from these heterostructures are presented. All of the films exhibited the strong, narrow spectral features characteristic of PbTiO{sub 3} perovskite-oxide crystals and indicative of high crystalline quality. The temperature behavior of the Raman modes, including the so-called ``soft-mode,`` was studied. A ``difference-Raman`` technique was used to distinguish the contributions of the PbTiO{sub 3} film and the KTaO{sub 3} single-crystal substrate.

  14. Free-standing thin film Ge single crystals grown by plasma-enhanced chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Outlaw, R. A.; Hopson, P., Jr.

    1984-01-01

    The films, which are approximately 10 microns in thickness, are grown epitaxially on polished (100) NaCl substrates at 450 C by plasma enhanced chemical vapor deposition. Upon cooling, the films are separated from the substrate by differential shear stress, leaving free-standing films of Ge which can be handled. Growths are attained by nucleating at minimum plasma power for very brief intervals and then raising the power to 65 W to increase the growth rate to approximately 10 microns/h. It is found that substrate exposure to the plasma at too high a power for too long a time sputters and erodes the surface, thereby substantially degrading the nucleation process and the ultimate growths. It is noted that the free-standing films are visually specular and exhibit a high degree of crystalline order when examined by X-ray diffraction. Auger electron spectroscopy and energy dispersive analysis of X-rays reveal no detectable bulk contamination.

  15. Structural evolution of platinum thin films grown by atomic layer deposition

    SciTech Connect

    Geyer, Scott M.; Methaapanon, Rungthiwa; Bent, Stacey; Johnson, Richard; Clemens, Bruce; Brennan, Sean; Toney, Mike F.

    2014-08-14

    The structural properties of Pt films grown by atomic layer deposition (ALD) are investigated with synchrotron based x-ray scattering and x-ray diffraction techniques. Using grazing incidence small angle scattering, we measure the lateral growth rate of the Pt islands to be 1.0 Å/cycle. High resolution x-ray diffraction reveals that the in-plane strain of the Pt lattice undergoes a transition from compressive strain to tensile strain when the individual islands coalescence into a continuous film. This transition to tensile strain is attributed to the lateral expansion that occurs when neighboring islands merge to reduce their surface energy. Using 2D grazing incidence x-ray diffraction, we show that the lattice orientation becomes more (111) oriented during deposition, with a sharp transition occurring during coalescence. Pt ALD performed at a lower deposition temperature (250 °C) is shown to result in significantly more randomly oriented grains.

  16. Magnetorefractive effect in the La1-xKxMnO3 thin films grown by MOCVD

    NASA Astrophysics Data System (ADS)

    Sukhorukov, Yu. P.; Telegin, A. V.; Bessonov, V. D.; Gan'shina, E. A.; Kaul', A. R.; Korsakov, I. E.; Perov, N. S.; Fetisov, L. Yu.; Yurasov, A. N.

    2014-10-01

    Thin epitaxial La1-хKхMnO3 films were grown using two-stage procedure. Influence of substitution of La3+ ions with K+ ions on the optical and electrical properties of La1-xKxMnO3 films (х=0.05, 0.10, 0.15 и 0.18) has been studied in detail. A noticeable magnetorefractive effect in the films under study was detected in the infrared range. Magnetorefractive effect as well as transverse magneto-optical Kerr effect and magnetoresistance have the maximum in optimally doped sample with x=0.18 corresponding to the highest Curie temperature. The experimental data for compositions close to optimally doped films are in good agreement with the data calculated in the framework of a theory developed for manganites. The resonance-like contribution to magnetoreflection spectra of manganite films has been observed in the vicinity of the phonon bands. It is shown that magnetic and charge inhomogeneities strongly influence on the magneto-optical effects in films. Thin films of La1-xKxMnO3 with the large values of Kerr and magnetorefractive effect are promising magneto-optical material in the infrared range.

  17. Thermoelectric transport and Hall measurements of low defect Sb2Te3 thin films grown by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Zastrow, S.; Gooth, J.; Boehnert, T.; Heiderich, S.; Toellner, W.; Heimann, S.; Schulz, S.; Nielsch, K.

    2013-03-01

    Sb2Te3 has recently been an object of intensive research since its promising applicability in thermoelectric, in phase-change memory devices and as a topological insulator. In this work, we report highly textured Sb2Te3 thin films, grown by atomic layer deposition on Si/SiO2 wafers based on the reaction of SbCl3 and (Et3Si)2Te. The low deposition temperature at 80 °C allows the pre-patterning of the Sb2Te3 by standard lithography processes. A platform to characterize the Seebeck coefficient S, the electrical conductivity σ as well as the Hall coefficient RH on the same film has been developed. Comparing all temperature-dependent transport properties, three different conductive regions in the temperature range of 50-400 K are found. Room temperature values of S = 146 × 10-6 VK-1, σ = 104 Sm-1 and mobility µ = 270.5 × 10-4 m2 V-1 s-1 are determined. The low carrier concentration in the range of n = 2.4 × 1018 cm-3 at 300 K quantifies the low defect content of the Sb2Te3 thin films.

  18. Growth parameters effect on the electric and thermoelectric characteristics of Bi 2Se 3 thin films grown by MOCVD system

    NASA Astrophysics Data System (ADS)

    Al Bayaz, A.; Giani, A.; Artaud, M. C.; Foucaran, A.; Pascal-Delannoy, F.; Boyer, A.

    2002-06-01

    Bi 2Se 3 thin films were grown by metal organic chemical vapour deposition (MOCVD) on pyrex substrate in an horizontal reactor using Trimethylbismuth (TMBi) and Diethylselinium (DESe) as metal-organic sources. The effect of the growth parameters such as substrate temperature, Tg, and TMBi partial pressure, PTMBi, on the structural, electrical and thermoelectrical properties of Bi 2Se 3 films, has been investigated. We noticed that a high growth temperature is very important for a good orientation of crystallites, which can be directly related to the best values of Hall mobility and Seebeck coefficient found. Therefore, a large stability of the reactions over the substrates with following growth conditions: 455°C⩽ Tg⩽485°C,0.5×10 -4⩽ PTMBi⩽1×10 -4 atm and a total hydrogen flow rate DT=3 slm, is achieved. In these optimal growth conditions, we found a better crystalline structure of Bi 2Se 3 thin films using X-ray diffraction. Thus, these layers always displayed n-type conduction using Hall effect, with carrier concentration close to 2×10 19 cm -3 and maximum values of Hall mobility and Seebeck coefficient of μ=247 cm 2/V s and | α|=120 μV/K respectively. Then, these films appear to be very promising for thermoelectric applications.

  19. Enhanced photocatalytic performance in atomic layer deposition grown TiO{sub 2} thin films via hydrogen plasma treatment

    SciTech Connect

    Sasinska, Alexander; Singh, Trilok; Wang, Shuangzhou; Mathur, Sanjay; Kraehnert, Ralph

    2015-01-15

    The authors report the effect of hydrogen plasma treatment on TiO{sub 2} thin films grown by atomic layer deposition as an effective approach for modifying the photoanode materials in order to enhance their photoelectrochemical performance. Hydrogen plasma treated TiO{sub 2} thin films showed an improved absorption in the visible spectrum probably due to surface reduction. XPS analysis confirmed the formation of Ti{sup 3+} states upon plasma treatment. Hydrogen plasma treatment of TiO{sub 2} films enhanced the measured photocurrent densities by a factor of 8 (1 mA/cm{sup 2} at 0.8 V versus normal hydrogen electrode) when compared to untreated TiO{sub 2} (0.12 mA/cm{sup 2}). The enhancement in photocurrent is attributed to the formation of localized electronic states in mid band-gap region, which facilitate efficient separation and transportation of photo excited charge carriers in the UV region of electromagnetic spectrum.

  20. Annealing effect on the optical and electrical properties of ZnO thin film grown on inp substrate

    NASA Astrophysics Data System (ADS)

    Ghosh, K.; Majumdar, S.; Bhunia, S.

    2012-06-01

    ZnO thin films have been fabricated by sublimation process on indium phosphide (InP) (111) substrates. These films were annealed at various temperatures in order to study the annealing effect on the optical and electrical properties of ZnO thin film grown on InP substrate. From photoluminescence study it was observed that the near band edge peak, i.e., excitonic peak, decreases drastically with the increase of annealing temperature. This indicates that at higher annealing temperature the recombinations are taking place in non-radiative way. It was also observed that the defect related broad peak around 500 nm, i.e., green luminescence peak for ZnO, increases at higher annealing temperatures. As O vacancy is responsible for the green luminescence, so more oxygen vacancies have been introduced at higher annealing temperatures. The electrical characterization of ZnO film revealed that the resistivity of the film increases with the increasing annealing temperatures. Ionised Zn interstitials contribute to carrier concentration in ZnO. Evaporation of Zn interstitials at higher annealing temperatures may have decreased the carrier concentration which in tern had increased the resistivity.

  1. NiO(s) (Bunsenite) is not Available to Alyssum species

    Technology Transfer Automated Retrieval System (TEKTRAN)

    AIMS: To determine if the Ni-hyperaccumulator Alyssum corsicum can absorb Ni from the kinetically inert crystalline mineral NiO(s) (bunsenite). METHODS: A. corsicum and A. montanum plants were grown for 30 days in a serpentine Hoagland solution. NiO was provided at 0 or 0.1 g L-1 (1.34 mmol L-1) ...

  2. The Seebeck Coefficient in Oxygen Enriched La2NiO4

    NASA Astrophysics Data System (ADS)

    Bach, Paul; Leboran, Victor; Rivadulla, Francisco

    2013-03-01

    Oxide-based devices show promise for themoelectric applications due to their chemical stability and straightforward fabrication. The La2NiO4+δ system has been predicted to show an increased thermopower coupled with an increased electrical conductivity around δ = 0 . 05 [Pardo et al. PRB 86, 165114 (2012)] that could lead to a large thermoelectric figure of merit (ZT). We investigate the suitability of lanthanum nickelate as a candidate material for high-ZT devices through a systematic study of oxygenated thin films grown by pulsed laser deposition. We report the electrical conductivity, Seebeck coefficient, and structural morphology of La2NiO4 grown in a range of oxidizing atmospheres and discuss their implications for controlled engineering of thermoelectric properties. We have explored the possibility of gate-tuning these systems in order to fabricate single-oxide based devices. This work was supported by the Ministerio de Ciencia e Innovación (Spain), grant MAT2010-16157, and the European Research Council, grant ERC-2010-StG 259082 2D THERMS.

  3. Electrochromism in surface modified crystalline WO3 thin films grown by reactive DC magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Karuppasamy, A.

    2013-10-01

    In the present work, tungsten oxide thin films were deposited at various oxygen chamber pressures (1.0-5.0 × 10-3 mbar) by maintaining the sputtering power density and argon pressure constant at 3.0 W/cm2 and 1.2 × 10-2 mbar, respectively. The role of surface morphology and porosity on the electrochromic properties of crystalline tungsten oxide thin films has been investigated. XRD and Raman studies reveal that all the samples post annealed at 450 ̊C in air for 3.0 h settle in monoclinic crystal system of tungsten oxide (W18O49). Though the phase of material is indifferent to oxygen pressure variations (PO2), morphology and film density shows a striking dependence on PO2. A systematic study on plasma (OES), morphology, optical and electrochromic properties of crystalline tungsten oxide reveal that the films deposited at PO2 of 2.0 × 10-3 mbar exhibit better coloration efficiency (58 cm2/C), electron/ion capacity (Qc: -25 mC/cm2), and reversibility (92%). This is attributed to the enhanced surface properties like high density of pores and fine particulates (100 nm) and to lesser bulk density of the film (ρ/ρo = 0.84) which facilitates the process of intercalation/de-intercalation of protons and electrons. These results show good promise toward stable and efficient crystalline tungsten oxide based electrochromic device applications.

  4. Negative Magnetoresistance of Indium Tin Oxide Nanoparticle Thin Films Grown by Chemical Thermolysis

    NASA Astrophysics Data System (ADS)

    Fujimoto, Akira; Yoshida, Kota; Higaki, Tomohiro; Kimura, Yuta; Nakamoto, Masami; Kashiwagi, Yukiyasu; Yamamoto, Mari; Saitoh, Masashi; Ohno, Toshinobu; Furuta, Shinya

    2013-02-01

    To clarify the electrical transport properties of nanostructured thin films, tin-doped indium oxide (ITO) nanoparticle (NP) solution-processed films were fabricated. An air-atmosphere, simple chemical thermolysis method was used to grow the ITO NPs, and the structural and electrical properties of spin-coated granular ITO NP films were investigated. X-ray diffraction measurements showed clear observation of the cubic indium oxide (222) diffraction peak, and films with a smaller Sn concentration were shown to have a better crystalline quality. We further explored the physical origin of the sign of the magnetoresistance (MR) in the variable-range hopping (VRH) region. A negative MR under a magnetic field perpendicular to the film surface increases with decreasing Sn concentration, and these results can be explained by the forward interference model in the VRH region. A larger negative MR is attributed to longer localization and hopping lengths, and better crystallinity. Thus, ITO NP thin films produced by this method are attractive candidates for oxide-based diluted magnetic semiconductors and other electronic devices.

  5. Multiferroic fluoride BaCoF4 Thin Films Grown Via Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Borisov, Pavel; Johnson, Trent; García-Castro, Camilo; Kc, Amit; Schrecongost, Dustin; Cen, Cheng; Romero, Aldo; Lederman, David

    Multiferroic materials exhibit exciting physics related to the simultaneous presence of multiple long-range orders, in many cases consisting of antiferromagnetic (AF) and ferroelectric (FE) orderings. In order to provide a new, promising route for fluoride-based multiferroic material engineering, we grew multiferroic fluoride BaCoF4 in thin film form on Al2O3 (0001) substrates by molecular beam epitaxy. The films grow with the orthorhombic b-axis out-of-plane and with three in-plane structural twin domains along the polar c-axis directions. The FE ordering in thin films was verified by FE remanent hysteresis loops measurements at T = 14 K and by room temperature piezoresponse force microscopy (PFM). An AF behavior was found below Neel temperature TN ~ 80 K, which is in agreement with the bulk properties. At lower temperatures two additional magnetic phase transitions at 19 K and 41 K were found. First-principles calculations demonstrated that the growth strain applied to the bulk BaCoF4 indeed favors two canted spin orders, along the b- and a-axes, respectively, in addition to the main AF spin order along the c-axis. Supported by FAME (Contract 2013-MA-2382), WV Research Challenge Grant (HEPC.dsr.12.29), and DMREF-NSF 1434897.

  6. Nanostructured and wide bandgap CdS:O thin films grown by reactive RF sputtering

    SciTech Connect

    Islam, M. A.; Rahman, K. S.; Haque, F.; Rashid, M. J.; Akhtaruzzaman, M.; Sopian, K.; Sulaiman, Y.; Amin, N.

    2015-05-15

    In this study, CdS:O thin films were prepared from a 99.999% CdS target by reactive sputtering in a Ar:O{sub 2} (99:1) ambient with different RF power at room temperature. The deposited films were studied by means of XRD, SEM, EDX, Hall Effect and UV-Vis spectrometry. The incorporations of O{sub 2} into the films were observed to increase with the decrease of deposition power. The cryatallinity of the films were reduced, whereas the band gaps of the films were increased by the increase of O{sub 2} content on the films. The films were found in nano-structured grains with a compact surface. It has been seen that the highest carrier density is observed in the film with O{sub 2} at.% 21.10, while the values decreased with the further increase or decrease of O{sub 2} content on the films; indicating that specific amount of donor like O{sub 2} atoms substitute to the S atoms can improve the carrier density of the CdS:O thin film.

  7. Magnetic Properties of FePt based Nanocomposite Thin Films Grown on Low Cost Substrates

    NASA Astrophysics Data System (ADS)

    Gayen, A.; Biswas, B.; Singh, A. K.; Saravanan, P.; Perumal, A.

    We report a systematic investigation of temperature dependent magnetic properties of FePt single and FePt(30)/M/Fe(5) nanocomposite thin films prepared by sputtering technique on low cost substrates at ambient temperature and post annealed at different temperatures. With increasing annealing temperature, L10 ordering, hard magnetic properties and thermal stability of FePt films are improved. The formation of interlayer exchange coupling between hard and soft magnetic layers in FePt/M(Al,Cu,C)/Fe films depends strongly on interlayer materials and interface morphology. A strong interlayer exchange coupling was achieved when the C interlayer thickness was about 0.5 nm, which enhances saturation magnetization largely. Also, the magnetization reversal process changes from incoherent to coherent switching process, which results a single hysteresis loop. High temperature magnetic studies revealed that the effective reduction in the coercivity decreases from 34 Oe/K to 13 Oe/K by the introduction of a thin C(0.5 nm) layer in FePt/C/Fe film. This reveals a promising approach to improve the stability of hard magnetic properties at high temperatures, suitable for high temperature magnetic applications.

  8. Microstructure comparison between KNbO 3 thin films grown by polymeric precursors and PLD methods

    NASA Astrophysics Data System (ADS)

    Weber, I. T.; Rousseau, A.; Guilloux-Viry, M.; Bouquet, V.; Perrin, A.

    2005-11-01

    KNbO 3 (KN) thin films were prepared by both Pulsed Laser Deposition (PLD) and Polymeric Precursor Route (PPR) onto polycrystalline alumina (Al 2O 3) and single-crystalline (100) SrTiO 3 substrates. Structural and microstructural characteristics of the thin films were determined by X-ray diffraction, field emission scanning electronic microscopy and electron channeling patterns in order to establish a correlation between the preparation method and the samples characteristics. It was evidenced that both methods are able to produce well crystallized single phase films presenting an epitaxial growth along 110 direction onto (100) SrTiO 3 substrates. PLD led to a highest crystalline quality ( Δω˜0.25° for PLD and Δω˜1° for PPR), while PPR provides crystallization at lower temperatures, without the appearance of secondary phases. The most remarkable difference between the methods concerns the film morphology (grain size and shape). In fact, deposition by these two routes gives access to various microstructures which open the way to specific study of physical behavior which currently depends on it.

  9. Reduced Cu concentration in CuAl-LPE-grown thin Si layers

    SciTech Connect

    Wang, T.H.; Ciszek, T.F.; Asher, S.; Reedy, R.

    1995-08-01

    Cu-Al has been found to be a good solvent system to grow macroscopically smooth Si layers with thicknesses in tens of microns on cast MG-Si substrates by liquid phase epitaxy (LPE) at temperatures near 900{degrees}C. This solvent system utilizes Al to ensure good wetting between the solution and substrate by removing silicon native oxides, and employs Cu to control Al doping into the layers. Isotropic growth is achieved because of a high concentration of solute silicon in the solution and the resulting microscopically rough interface. The incorporation of Cu in the Si layers, however, was a concern since Cu is a major solution component and is generally regarded as a bad impurity for silicon devices due to its fast diffusivity and deep energy levels in the band gap. A study by Davis shows that Cu will nonetheless not degrade solar cell performance until above a level of 10{sup 17} cm{sup -3}. This threshold is expected to be even higher for thin layer silicon solar cells owing to the less stringent requirement on minority carrier diffusion length. But to ensure long term stability of solar cells, lower Cu concentrations in the thin layers are still preferred.

  10. Effects of Precursor Concentration on Structural and Optical Properties of ZnO Thin Films Grown on Muscovite Mica Substrates by Sol-Gel Spin-Coating.

    PubMed

    Kim, Younggyu; Leem, Jae-Young

    2016-05-01

    The structural and optical properties of the ZnO thin films grown on mica substrates for different precursor concentrations were investigated. The surface morphologies of all the samples indicated that they consisted of granular structures with spherical nano-sized crystallites. The thickness of the ZnO thin films increased significantly and the optical band gap exhibited a blue shift with an increase in the precursor concentration. It is remarkable that the highest I(NBE)/I(DLE) ratio was observed for the ZnO thin film with 0.8 M precursor concentration, even though cracks formed on the surface of this film. PMID:27483897

  11. Microstructure investigation and magnetic study of permalloy thin films grown by thermal evaporation

    NASA Astrophysics Data System (ADS)

    Lamrani, Sabrina; Guittoum, Abderrahim; Schäfer, Rudolf; Pofahl, Stefan; Neu, Volker; Hemmous, Messaoud; Benbrahim, Nassima

    2016-06-01

    We study the effect of thickness on the structural and magnetic properties of permalloy thin films, evaporated on glass substrate. The films thicknesses range from 16 to 90 nm. From X-ray diffraction spectra analysis, we show that the thinner films present a "1,1,1" preferred orientation. However, the thicker films exhibit a random orientation. The grains size increases and the lattice parameter decreases with increasing thickness. The magnetic force microscopy observations display cross-tie walls features only for the two thicker films (60 and 90 nm thick films). The magnetic microstructure, carried out by Kerr microscopy technique, shows the presence of magnetic domains changing with the direction of applied magnetic field. The coercive field, Hc, was found to decrease from 6.5 for 16 to 1.75 Oe for 90 nm. All these results will be discussed and correlated.

  12. Structural, optical and magnetic properties of Fe-doped barium stannate thin films grown by PLD

    NASA Astrophysics Data System (ADS)

    James, K. K.; Aravind, Arun; Jayaraj, M. K.

    2013-10-01

    Barium stannate is a wide band gap semiconductor with cubic perovskite structure. Polycrystalline bulk samples of BaSn1-xFexO3d (BFS), with x = 0.00, 0.02, 0.03, 0.05 and 0.10 were prepared by solid-state reaction. In this paper, we report the growth of undoped and Fe doped barium stannate thin films on fused silica substrate using pulsed laser deposition (PLD) technique at a relatively high substrate temperature and low oxygen pressure. The deposited films have wide bandgap and are transparent in the visible region. The X-ray diffraction analysis of the films confirmed the cubic structure. Microstructural studies were carried out using micro-Raman spectroscopy and AFM analysis. Defect induced Raman shifts were observed in the samples. Magnetic studies revealed an increase in magnetic properties for films doped with 10 at% Fe doped samples.

  13. Intermodulation distortion measurements of MgB2 thin films grown by HPCVD

    NASA Astrophysics Data System (ADS)

    Cifariello, G.; Aurino, M.; di Gennaro, E.; Lamura, G.; Orgiani, P.; Villegier, J.-C.; Xi, X. X.; Andreone, A.

    2006-06-01

    The two tone intermodulation distortion (IMD) arising in MgB2 thin films synthesized by hybrid physical-chemical vapour deposition (HPCVD) is studied in order to probe the influence of the two bands on the symmetry of the gap function. The measurements are carried out by using a dielectrically loaded copper cavity operating at 7 GHz. Microwave data on samples having critical temperatures above 41 K, very low resistivity values, and residual resistivity ratio larger than 10, are shown. The dependence of the nonlinear surface losses and of the third order intermodulation products on the power feeding the cavity and on the temperature is analyzed. At low power, IMD versus temperature data show the intrinsic s-wave behaviour expected for this compound

  14. Synthesis of LECBD grown cluster assembled SeO 2 thin films

    NASA Astrophysics Data System (ADS)

    Rath, S.; Das, K.; Sarangi, S. N.; Dash, A. K.; Ray, S. K.; Sahu, S. N.

    2006-12-01

    Cluster assembled selenium oxide (SeO 2) thin films, as a function of oxygen flow pressure (OFP) have been synthesized by a low energy cluster beam deposition (LECBD) technique. The OFP dependent surface morphology leading to well separated nanoclusters (size ranging from 50 to 200 nm) and fractal features are confirmed from transmission electron microscopic (TEM) measurements. A diffusion limited aggregation (DLA) mediated fractal growth with dimension as 1.71 ± 0.01 has been observed for high OFP (60 mbar). Structural analysis by glancing angle X-ray diffraction (GXRD) and selected area diffraction (SAD) studies identify the presence of tetragonal phase SeO 2 in the deposit. Micro-Raman studies indicate the shifts in bending and stretching vibrational phonon modes in cluster assembled SeO 2 as compared to their bulk counter part due to the phonon confinement effect.

  15. Ferromagnetic resonance of patterned chromium dioxide thin films grown by selective area chemical vapour deposition

    NASA Astrophysics Data System (ADS)

    Durrant, C. J.; Jokubaitis, M.; Yu, W.; Mohamad, H.; Shelford, L. R.; Keatley, P. S.; Xiao, Gang; Hicken, R. J.

    2015-05-01

    A selective area chemical vapour deposition technique has been used to fabricate continuous and patterned epitaxial CrO2 thin films on (100)-oriented TiO2 substrates. Precessional magnetization dynamics were stimulated both electrically and optically, and probed by means of time-resolved Kerr microscopy and vector network analyser ferromagnetic resonance techniques. The dependence of the precession frequency and the effective damping parameter upon the static applied magnetic field were investigated. All films exhibited a large in-plane uniaxial anisotropy. The effective damping parameter was found to exhibit strong field dependence in the vicinity of the hard axis saturation field. However, continuous and patterned films were found to possess generally similar dynamic properties, confirming the suitability of the deposition technique for fabrication of future spintronic devices.

  16. Crystallization kinetics of GeTe phase-change thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Sun, Xinxing; Thelander, Erik; Gerlach, Jürgen W.; Decker, Ulrich; Rauschenbach, Bernd

    2015-07-01

    Pulsed laser deposition was employed to the growth of GeTe thin films on Silicon substrates. X-ray diffraction measurements reveal that the critical crystallization temperature lies between 220 and 240 °C. Differential scanning calorimetry was used to investigate the crystallization kinetics of the as-deposited films, determining the activation energy to be 3.14 eV. Optical reflectivity and in situ resistance measurements exhibited a high reflectivity contrast of ~21% and 3-4 orders of magnitude drop in resistivity of the films upon crystallization. The results show that pulsed laser deposited GeTe films can be a promising candidate for phase-change applications.

  17. Thermal stability of MBE-grown epitaxial MoSe2 and WSe2 thin films

    NASA Astrophysics Data System (ADS)

    Chang, Young Jun; Choy, Byoung Ki; Phark, Soo-Hyon; Kim, Minu

    Layered transition metal dichalcogenides (TMDs) draw much attention, because of its unique optical properties and band structures depending on the layer thicknesses. However, MBE growth of epitaxial films demands information about thermal stability of stoichiometry and related electronic structure for high temperature range. We grow epitaxial MoSe2 and WSe2 ultrathin films by using molecular beam epitaxy (MBE). We characterize stoichiometry of films grown at various growth temperature by using various methods, XPS, EDX, and TOF-MEIS. We further test high temperature stability of electronic structure for those films by utilizing in-situ ellipsometry attached to UHV chamber. We discuss threshold temperatures up to 700~1000oC, at which electronic phases changes from semiconductor to metal due to selenium deficiency. This information can be useful for potential application of TMDs for fabrication of Van der Waals multilayers and related devices. This research was supported by Nano.Material Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning. (2009-0082580), NRF-2014R1A1A1002868.

  18. Anisotropic properties of molecular beam epitaxy-grown colossal magnetoresistance manganite thin films

    SciTech Connect

    ODonnell, J.; Onellion, M.; Rzchowski, M.S.; Eckstein, J.N.; Bozovic, I.

    1997-04-01

    We show that both the magnetoresistance and magnetism in tetragonal MBE-grown films of La{sub 1{minus}x}Ca{sub x}MnO{sub 3} show anisotropic effects that depend on both temperature and magnetic field. We show that the {open_quotes}colossal{close_quotes} magnetoresistance depends on the angle between the magnetization and the transport current and that the size of this effect is temperature-dependent. Below the Curie temperature this results in an unusual upturn in the magnetoresistance for small magnetic fields normal to the plane of the film as the magnetization rotates out of the plane. Low-field hysteresis of the in-plane magnetoresistance is also observed, and also shows an anisotropy with respect to the current and magnetization directions. We also find an in-plane biaxial magnetocrystalline anisotropy with easy axes along the {l_brace}100{r_brace} (Mn{endash}O) crystal directions, and evidence for {ital c}-axis magnetocrystalline anisotropy. {copyright} {ital 1997 American Institute of Physics.}

  19. Electrical parameters of thin nanoscale SiOx layers grown on plasma hydrogenated silicon

    NASA Astrophysics Data System (ADS)

    Alexandrova, S.; Szekeres, A.; Halova, E.; Kojuharova, N.

    2014-12-01

    In the present paper results are presented on electrical characterization of the interface Si/SiOx, formed by oxidation on Si wafers, previously exposed to rf hydrogen plasma. As a tool of investigations multiple frequency C-V and G-V measurements are applied. The data analysis was performed using two-frequency method to extract generalized frequency independent C-V characteristic. Interface trap densities were evaluated from the generalized C-V data by comparison with theoretical data for an ideal interface. A set of localized states, acting as interface traps, was found that characterize the interface of Si to substoichiometric SiOx, layer with x < 2. The dielectric constant of the oxides was calculated from the capacitance in accumulation of the generalized C-V curves. The thickness and the refractive index of the oxide layers were obtained from ellipsometric data analysis assuming the oxide-Si substrate as single layer system. From the data for the dielectric constant and refractive index suggestion is made that the grown oxides on hydrogenated Si contain voids thus reducing the dielectric constant. Correlation with oxide mechanical stress is found.

  20. The annealing effects of V-doped GaN thin films grown by MOCVD

    NASA Astrophysics Data System (ADS)

    Souissi, M.; Bouzidi, M.; El Jani, B.

    2012-02-01

    We have investigated the annealing effect of V-doped GaN (GaN:V) epitaxial layers grown on sapphire by metal organic chemical vapor deposition (MOCVD). The film was annealed at a temperature of 1075 °C for 30 min in N 2 ambient after growth. The structural, surface morphology and optical properties of GaN:V films were studied by high resolution X-ray diffraction (HRXRD), atomic force microscope (AFM) and photoluminescence (PL). The results show that the annealing makes for the destruction in the crystal quality and surface morphology. After thermal annealing, the photoluminescence (PL) measurement showed a reduction of the blue luminescence (BL) band observed in GaN:V at room temperature (RT). The phenomenon is attributed to vanadium diffusion or to the V-related complex dissociation. Near-band-edge (NBE) peak exhibited a red shift after 1075 °C anneal. This is due to the decrease in the level of strain. In the infrared region, we observed the emergence of the line 0.93 eV accompanied by a decrease in the intensity of the 0.82 eV emission. Their possible origins are discussed.

  1. The effects of oxygen pressure on disordering and magneto-transport properties of Ba2FeMoO6 thin films grown via pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Kim, Kyeong-Won; Ghosh, Siddhartha; Buvaev, Sanal; Mhin, Sungwook; Jones, Jacob L.; Hebard, Arthur F.; Norton, David P.

    2015-07-01

    Epitaxial Ba2FeMoO6 thin films were grown via pulsed laser deposition under low oxygen pressure and their structural, chemical, and magnetic properties were examined, focusing on the effects of oxygen pressure. The chemical disorder, off-stoichiometry in B site cations (Fe and Mo) increased with increasing oxygen pressure and thus magnetic properties were degraded. Interestingly, in contrast, negative magneto-resistance, which is the characteristics of this double perovskite material, was enhanced with increasing oxygen pressure. It is believed that phase segregation of highly disordered thin films is responsible for the increased magneto-resistance of thin films grown at high oxygen pressure. The anomalous Hall effect, which behaves hole-like, was also observed due to spin-polarized itinerant electrons under low magnetic field below 1 T and the ordinary electron-like Hall effect was dominant at higher magnetic fields.

  2. Polycrystalline SrFe12O19 thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Garcia, Tupac; de Posada, E.; Jimenez, Ernesto; Sanchez Ll., J. L.; Diaz Castanon, S.; Bartolo-Perez, Pascual; Cauich, W.; Oliva, I.; Pena, J. L.; Ceh, O.

    1999-07-01

    Polycrystalline SrFe12O19 thin films were deposited on Si (100) substrates by PLD using a Nd-YAG laser ((lambda) equals 1064 nm). During the deposition process substrates were kept at room temperature. As-deposited films were annealed in air at temperatures between 600 degree(s)C and 840 degree(s)C. Samples were characterized by AES, ESCA, SEM, AFM, x-ray diffraction and VSM. It is presented the relevance of the preparation of the target surface on the film quality. Some differences in the chemical composition of as-deposited films, compared with the target and the annealed films, were observed. The x-ray diffraction spectra show a textured as- deposited films. Samples annealed at 600 degree(s)C, and below, showed a very weak magnetic response. In contrast annealing in the temperature range 700 degree(s)C - 840 degree(s)C led to the formation of a nanocrystalline particle system (average particle size 150 - 350 nm) which behave as a single domain in the thermally demagnetized state. The obtained coercivities (5750 - 6850 Oe) are among the highest values reported for films, powders and sintered samples.

  3. Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Santra, T. S.; Liu, C. H.; Bhattacharyya, T. K.; Patel, P.; Barik, T. K.

    2010-06-01

    Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of CC, CH, SiC, and SiH bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio ID/IG. Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

  4. Thermally Driven Stability of Octadecylphosphonic Acid Thin Films Grown on SS316L

    PubMed Central

    Lim, Min Soo; Smiley, Katelyn J.; Gawalt, Ellen S.

    2010-01-01

    Stainless steel 316L is widely used as a biomedical implant material; however, there is concern about the corrosion of metallic implants in the physiological environment. The corrosion process can cause mechanical failure due to resulting cracks and cavities in the implant. Alkyl phosphonic acid forms a thin film by self-assembly on the stainless steel surface and this report conclusively shows that thermal treatment of the octadecylphosphonic acid (ODPA) film greatly enhances the stability of the ODPA molecules on the substrate surface. AFM images taken from the modified substrates revealed that thermally treated films remain intact after methanol, THF and water flushes while untreated films suffer substantial loss. Water contact angles also show that the hydrophobicity of thermally treated films does not diminish after being incubated in a dynamic flow of water for a three hour period while the untreated film becomes increasingly hydrophilic due to loss of ODPA. IR spectra taken of both treated and untreated films after water and THF flushes show that the remaining film retains its initial crystallinity. A model is suggested to explain the stability of ODPA film enhanced by thermal treatment. An ODPA molecule is physisorbed to the surface weakly by hydrogen bonding. Heating drives away water molecules leading to the formation of strong monodentate or mixed mono/bi-dentate bonds of ODPA molecule to the surface. PMID:20648546

  5. Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

    SciTech Connect

    Santra, T. S.; Liu, C. H.; Bhattacharyya, T. K.; Patel, P.; Barik, T. K.

    2010-06-15

    Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of C-C, C-H, Si-C, and Si-H bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio I{sub D}/I{sub G}. Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

  6. Magnetic Properties of Polycrystalline Bismuth Ferrite Thin Films Grown by Atomic Layer Deposition.

    PubMed

    Jalkanen, Pasi; Tuboltsev, Vladimir; Marchand, Benoît; Savin, Alexander; Puttaswamy, Manjunath; Vehkamäki, Marko; Mizohata, Kenichiro; Kemell, Marianna; Hatanpää, Timo; Rogozin, Valentin; Räisänen, Jyrki; Ritala, Mikko; Leskelä, Markku

    2014-12-18

    The atomic layer deposition (ALD) method was applied to grow thin polycrystalline BiFeO3 (BFO) films on Pt/SiO2/Si substrates. The 50 nm thick films were found to exhibit high resistivity, good morphological integrity, and homogeneity achieved by the applied ALD technique. Magnetic characterization revealed saturated magnetization of 25 emu/cm(3) with temperature-dependent coercivity varying from 5 to 530 Oe within the temperature range from 300 to 2 K. Magnetism observed in the films was found to change gradually from ferromagnetic spin ordering to pinned magnetic domain interactions mixed with weak spin-glass-like behavior of magnetically frustrated antiferromagnetic/ferromagnetic (AFM-FM) spin ordering depending on the temperature and magnitude of the applied magnetic field. Antiferromagnetic order of spin cycloids was broken in polycrystalline films by crystal sizes smaller than the cycloid length (∼60 nm). Uncompensated spincycloids and magnetic domain walls were found to be the cause of the high magnetization of the BFO films. PMID:26273981

  7. Thermally driven stability of octadecylphosphonic acid thin films grown on SS316L.

    PubMed

    Lim, Min Soo; Smiley, Katelyn J; Gawalt, Ellen S

    2010-01-01

    Stainless steel 316L is widely used as a biomedical implant material; however, there is concern about the corrosion of metallic implants in the physiological environment. The corrosion process can cause mechanical failure due to resulting cracks and cavities in the implant. Alkyl phosphonic acid forms a thin film by self-assembly on the stainless steel surface and this report conclusively shows that thermal treatment of the octadecylphosphonic acid (ODPA) film greatly enhances the stability of the ODPA molecules on the substrate surface. AFM images taken from the modified substrates revealed that thermally treated films remain intact after methanol, THF, and water flushes, whereas untreated films suffer substantial loss. Water contact angles also show that the hydrophobicity of thermally treated films does not diminish after being incubated in a dynamic flow of water for a 3-hour period, whereas the untreated film becomes increasingly hydrophilic due to loss of ODPA. IR spectra taken of both treated and untreated films after water and THF flushes show that the remaining film retains its initial crystallinity. A model is suggested to explain the stability of ODPA film enhanced by thermal treatment. An ODPA molecule is physisorbed to the surface weakly by hydrogen bonding. Heating drives away water molecules leading to the formation of strong monodentate or mixed mono/bi-dentate bonds of ODPA molecule to the surface. PMID:20648546

  8. Properties of MBE-grown NbO2 thin films

    NASA Astrophysics Data System (ADS)

    Demkov, Alex; O'Hara, Andy; Posadas, Agham

    2014-03-01

    Niobium dioxide or NbO2 a sister compound of the more celebrated VO2, belongs to the class of transition metal oxides that undergo a temperature-driven metal-to-insulator transition. Using density functional theory, we explore the electronic properties of both the high-temperature metallic rutile and the low-temperature insulating distorted rutile phases. We investigate the nature of the transition and predict a large carrier concentration change even at the high transition temperature of 1080 K. We also grew thin NbO2 films on LSAT(111) single crystal substrates using molecular beam epitaxy. The films show very good crystallinity with a single out-of-plane orientation by x-ray diffraction, and exhibit a smooth surface with the presence of three epitaxial domains as observed by reflection high energy electron diffraction. The NbO2 stoichiometry is confirmed by x-ray photoemission measurements of the Nb 3d core level as well as the valence band.

  9. Quantum dot FRET-based probes in thin films grown in microfluidic channels.

    PubMed

    Crivat, Georgeta; Da Silva, Sandra Maria; Reyes, Darwin R; Locascio, Laurie E; Gaitan, Michael; Rosenzweig, Nitsa; Rosenzweig, Zeev

    2010-02-10

    This paper describes the development of new fluorescence resonance energy transfer (FRET)-based quantum dot probes for proteolytic activity. The CdSe/ZnS quantum dots are incorporated into a thin polymeric film, which is prepared by layer-by-layer deposition of alternately charged polyelectrolytes. The quantum dots, which serve as fluorescent donors, are separated from rhodamine acceptor molecules, which are covalently attached to the film surface by a varying number of polyelectrolyte layers. When excited with visible light, the emission color of the polyelectrolyte multilayer film appears orange due to FRET between the quantum dots and molecular acceptors. The emission color changes to green when the rhodamine molecules are removed from the surface by enzymatic cleavage. The new probe design enables the use of quantum dots in bioassays, in this study for real-time monitoring of trypsin activity, while alleviating concerns about their potential toxicity. Application of these quantum dot FRET-based probes in microfluidic channels enables bioanalysis of volume-limited samples and single-cell studies in an in vivo-like environment. PMID:20073459

  10. Design of step composition gradient thin film transistor channel layers grown by atomic layer deposition

    SciTech Connect

    Ahn, Cheol Hyoun; Hee Kim, So; Gu Yun, Myeong; Koun Cho, Hyung

    2014-12-01

    In this study, we proposed the artificially designed channel structure in oxide thin-film transistors (TFTs) called a “step-composition gradient channel.” We demonstrated Al step-composition gradient Al-Zn-O (AZO) channel structures consisting of three AZO layers with different Al contents. The effects of stacking sequence in the step-composition gradient channel on performance and electrical stability of bottom-gate TFT devices were investigated with two channels of inverse stacking order (ascending/descending step-composition). The TFT with ascending step-composition channel structure (5 → 10 → 14 at. % Al composition) showed relatively negative threshold voltage (−3.7 V) and good instability characteristics with a reduced threshold voltage shift (Δ 1.4 V), which was related to the alignment of the conduction band off-set within the channel layer depending on the Al contents. Finally, the reduced Al composition in the initial layer of ascending step-composition channel resulted in the best field effect mobility of 4.5 cm{sup 2}/V s. We presented a unique active layer of the “step-composition gradient channel” in the oxide TFTs and explained the mechanism of adequate channel design.

  11. The orientational relationship between monoclinic β-Ga2O3 and cubic NiO

    NASA Astrophysics Data System (ADS)

    Nakagomi, Shinji; Kubo, Shohei; Kokubun, Yoshihiro

    2016-07-01

    The orientational relationship between β-Ga2O3 and NiO was studied by X-ray diffraction measurements and cross-sectional high resolution transmission electron microscopy. A β-Ga2O3 thin film was formed on a (100) NiO layer on a (100) MgO substrate by gallium evaporation in an oxygen plasma. It was found that the resulting β-Ga2O3 had a four-fold domain structure satisfying both (100) β-Ga2O3 ‖ (100) NiO and (010) β-Ga2O3 ‖ {011} NiO. A γ-Ga2O3 layer was observed at the interface between the β-Ga2O3 and the NiO. An NiO film was also formed on a (100) β-Ga2O3 single-crystal substrate by the sol-gel method. An epitaxial (100) NiO film was formed on a (100) β-Ga2O3 substrate, and satisfied (011) NiO ‖ (010) β-Ga2O3. The crystal orientations of β-Ga2O3 on (100) NiO and NiO on (100) β-Ga2O3 can be explained using atomic arrangement models of the (100) plane of NiO and the (100) plane of β-Ga2O3.

  12. Enhancement of thickness uniformity of thin films grown by pulsed laser deposition

    NASA Technical Reports Server (NTRS)

    Fernandez, Felix E.

    1995-01-01

    A peculiarity of the pulsed laser deposition technique of thin-film growth which limits its applicability is the very rapid drop of resulting film thickness as a function of distance from the deposition axis. This is due to the narrow forward peaking of the emission plume characteristic of the laser ablation process. The plume is usually modeled by a cos(sup n) theta function with n greater, and in some cases, much higher, than 1. Based on this behavior, a method is presented to substantially enhance coverage uniformity in substrate zones of the order of the target-substrate distance h, and to within a specified thickness tolerance. Essentially, target irradiation is caused to form an annular emission source instead of the usual spot. By calculating the resulting thickness profiles, an optimum radius s is found for the annular source, corresponding to a given power in the emission characteristic and a given value of h. The radius of this annulus scales with h. Calculated numerical results for optimal s/h ratios corresponding to a wide range of values for n are provided for the case of +/- 1% tolerance in deviation from the thickness at deposition axis. Manners of producing annular illumination of the target by means of conic optics are presented for the case of a laser beam with radially symmetric profile. The region of uniform coverage at the substrate can be further augmented by extension of the method to multiple concentric annular sources. By using a conic optic of novel design, it is shown also how a single-laser beam can be focused onto a target in the required manner. Applicability of the method would be limited in practice by the available laser power. On the other hand, the effective emitting area can be large, which favors extremely high growth rates, and since growth can occur uniformly over the whole substrate for each laser pulse, single-shot depositions with substantial thicknesses are possible. In addition, the simultaneity of growth over the

  13. Impact of low temperature annealing on structural, optical, electrical and morphological properties of ZnO thin films grown by RF sputtering for photovoltaic applications

    NASA Astrophysics Data System (ADS)

    Purohit, Anuradha; Chander, S.; Sharma, Anshu; Nehra, S. P.; Dhaka, M. S.

    2015-11-01

    This paper presents effect of low temperature annealing on the physical properties of ZnO thin films for photovoltaic applications. The thin films of thickness 50 nm were grown on glass and indium tin oxide (ITO) coated glass substrates employing radio frequency magnetron sputtering technique followed by thermal annealing within low temperature range 150-450 °C. These as-grown and annealed films were subjected to the X-ray diffraction (XRD), UV-Vis spectrophotometer, source meter and scanning electron microscopy (SEM) for structural, optical, electrical and surface morphological analysis respectively. The compositional analysis of the as-grown ZnO film was also carried out using energy dispersive spectroscopy (EDS). The XRD patterns reveal that the films have wurtzite structure of hexagonal phase with preferred orientation (1 0 0) and polycrystalline in nature. The crystallographic and optical parameters are calculated and discussed in detail. The optical band gap was found in the range 3.30-3.52 eV and observed to decrease with annealing temperature except 150 °C. The current-voltage characteristics show that the films exhibit approximately ohmic behavior. The SEM studies show that the films are uniform, homogeneous and free from crystal defects and voids. The experimental results reveal that ZnO thin films may be used as alternative materials for eco-friendly buffer layer to the thin film solar cell applications.

  14. Photoconductivity of ultra-thin Ge(GeSn) layers grown in Si by low-temperature molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Talochkin, A. B.; Chistokhin, I. B.; Mashanov, V. I.

    2016-04-01

    Photoconductivity (PC) spectra of Si/Ge(GeSn)/Si structures with the ultra-thin (1.0-2.3 nm) Ge and GeSn alloy layers grown by the low-temperature (T = 100 °C) molecular beam epitaxy are studied. Photoresponse in the range of 1.2-0.4 eV related to light absorption in the buried Ge(GeSn) layer is observed. It is shown that in case of lateral PC, a simple diffusion model can be used to determine the absorption coefficient of this layer α ˜ 105 cm-1. This value is 100 times larger than that of a single Ge quantum dot layer and is reached significantly above the band gap of most bulk semiconductors. The observed absorption is caused by optical transitions between electron and hole states localized at the interfaces. The anomalous high value of α can be explained by the unusual state of Ge(GeSn) layer with high concentration of dangling bonds, the optical properties of which have been predicted theoretically by Knief and von Niessen (Phys. Rev. B 59, 12940 (1999)).

  15. Production and characterization of Nd,Cr:GSGG thin films on Si(001) grown by pulsed laser ablation

    NASA Astrophysics Data System (ADS)

    Willmott, P. R.; Manoravi, P.; Holliday, K.

    Nd,Cr:Gd3Sc2Ga3O12 (GSGG) thin films have been produced for the first time. They were grown on Si(001) substrates at 650 °C by pulsed laser ablation at 248 nm of a crystalline Nd,Cr:GSGG target rod. The laser plume was analyzed using time-of-flight quadrupole mass spectroscopy, and consisted of elemental and metal oxide fragments with kinetic energies typically in the range 10 to 40 eV, though extending up to 100 eV. Although films deposited in vacuum using laser fluences of 0.8+/-0.1 Jcm-2 reproduced the Nd,Cr:GSGG bulk stoichiometry, those deposited using fluences above 3 Jcm-2 resulted in noncongruent material transfer and were deficient in Ga and Cr. Attempts to grow films using synchronized oxygen or oxygen/argon pulses yielded mixed oxide phases. Under optimal growth conditions, the films were heteroepitaxial, with GSGG(001)[100]∥Si(001)[100], and exhibited Volmer-Weber-type growth. Room-temperature emission spectra of the films suggest efficient non-radiative energy transfer between Cr3+ and Nd3+ ions, similar to that of the bulk crystal.

  16. Thickness-dependent transport channels in topological insulator Bi2Se3 thin films grown by magnetron sputtering

    PubMed Central

    Wang, Wen Jie; Gao, Kuang Hong; Li, Zhi Qing

    2016-01-01

    We study the low-temperature transport properties of Bi2Se3 thin films grown by magnetron sputtering. A positive magnetoresistance resulting from the weak antilocalization (WAL) effect is observed at low temperatures. The observed WAL effect is two dimensional in nature. Applying the Hikami-Larkin-Nagaoka theory, we have obtained the dephasing length. It is found that the temperature dependence of the dephasing length cannot be described only by the Nyquist electron-electron dephasing, in conflict with prevailing experimental results. From the WAL effect, we extract the number of the transport channels, which is found to increase with increasing the thickness of the films, reflecting the thickness-dependent coupling between the top and bottom surface states in topological insulator. On the other hand, the electron-electron interaction (EEI) effect is observed in temperature-dependent conductivity. From the EEI effect, we also extract the number of the transport channel, which shows similar thickness dependence with that obtained from the analysis of the WAL effect. The EEI effect, therefore, can be used to analyze the coupling effect between the top and bottom surface states in topological insulator like the WAL effect. PMID:27142578

  17. Thickness-dependent transport channels in topological insulator Bi2Se3 thin films grown by magnetron sputtering.

    PubMed

    Wang, Wen Jie; Gao, Kuang Hong; Li, Zhi Qing

    2016-01-01

    We study the low-temperature transport properties of Bi2Se3 thin films grown by magnetron sputtering. A positive magnetoresistance resulting from the weak antilocalization (WAL) effect is observed at low temperatures. The observed WAL effect is two dimensional in nature. Applying the Hikami-Larkin-Nagaoka theory, we have obtained the dephasing length. It is found that the temperature dependence of the dephasing length cannot be described only by the Nyquist electron-electron dephasing, in conflict with prevailing experimental results. From the WAL effect, we extract the number of the transport channels, which is found to increase with increasing the thickness of the films, reflecting the thickness-dependent coupling between the top and bottom surface states in topological insulator. On the other hand, the electron-electron interaction (EEI) effect is observed in temperature-dependent conductivity. From the EEI effect, we also extract the number of the transport channel, which shows similar thickness dependence with that obtained from the analysis of the WAL effect. The EEI effect, therefore, can be used to analyze the coupling effect between the top and bottom surface states in topological insulator like the WAL effect. PMID:27142578

  18. Surface sulfurization on MBE-grown Cu(In1-x,Gax)Se2 thin films and devices

    NASA Astrophysics Data System (ADS)

    Khatri, Ishwor; Matsuyama, Isamu; Yamaguchi, Hiroshi; Fukai, Hirofumi; Nakada, Tokio

    2015-08-01

    Molecular beam epitaxy (MBE) grown Cu(In1-x,Gax)Se2 (CIGS) thin films were sulfurized at temperatures of 450-550 °C for 30 min in a 10% H2S-N2 mixture gas. The micro-roughness together with the S diffusion in the CIGS surfaces increased with increasing sulfurization temperature. Both near-band-edge PL intensity and decay time of the CIGS absorber layer enhanced after sulfurization. PL sub-peak around 80 meV below the main peak almost disappeared after sulfurization above 500 °C, which is expected due to the occupation of Se vacancies (Vse) with S. The open-circuit voltage (Voc), hence conversion efficiency, improved after sulfurization. The photovoltaic performance of the solar cells was consistent with PL intensity. Moreover, it is found for the first time from the SIMS analysis that the Cu atoms were depleted at the surface of CIGS layer after sulfurization, which could result in the improved Voc.

  19. Thickness-dependent transport channels in topological insulator Bi2Se3 thin films grown by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Wang, Wen Jie; Gao, Kuang Hong; Li, Zhi Qing

    2016-05-01

    We study the low-temperature transport properties of Bi2Se3 thin films grown by magnetron sputtering. A positive magnetoresistance resulting from the weak antilocalization (WAL) effect is observed at low temperatures. The observed WAL effect is two dimensional in nature. Applying the Hikami-Larkin-Nagaoka theory, we have obtained the dephasing length. It is found that the temperature dependence of the dephasing length cannot be described only by the Nyquist electron-electron dephasing, in conflict with prevailing experimental results. From the WAL effect, we extract the number of the transport channels, which is found to increase with increasing the thickness of the films, reflecting the thickness-dependent coupling between the top and bottom surface states in topological insulator. On the other hand, the electron-electron interaction (EEI) effect is observed in temperature-dependent conductivity. From the EEI effect, we also extract the number of the transport channel, which shows similar thickness dependence with that obtained from the analysis of the WAL effect. The EEI effect, therefore, can be used to analyze the coupling effect between the top and bottom surface states in topological insulator like the WAL effect.

  20. Thin yttrium iron garnet films grown by pulsed laser deposition: Crystal structure, static, and dynamic magnetic properties

    NASA Astrophysics Data System (ADS)

    Sokolov, N. S.; Fedorov, V. V.; Korovin, A. M.; Suturin, S. M.; Baranov, D. A.; Gastev, S. V.; Krichevtsov, B. B.; Maksimova, K. Yu.; Grunin, A. I.; Bursian, V. E.; Lutsev, L. V.; Tabuchi, M.

    2016-01-01

    Pulsed laser deposition has been used to grow thin (10-84 nm) epitaxial layers of Yttrium Iron Garnet Y3Fe5O12 (YIG) on (111)-oriented Gadolinium Gallium Garnet substrates at different growth conditions. Atomic force microscopy showed flat surface morphology both on micrometer and nanometer scales. X-ray diffraction measurements revealed that the films are coherent with the substrate in the interface plane. The interplane distance in the [111] direction was found to be by 1.2% larger than expected for YIG stoichiometric pseudomorphic film indicating presence of rhombohedral distortion in this direction. Polar Kerr effect and ferromagnetic resonance measurements showed existence of additional magnetic anisotropy, which adds to the demagnetizing field to keep magnetization vector in the film plane. The origin of the magnetic anisotropy is related to the strain in YIG films observed by XRD. Magneto-optical Kerr effect measurements revealed important role of magnetization rotation during magnetization reversal. An unusual fine structure of microwave magnetic resonance spectra has been observed in the film grown at reduced (0.5 mTorr) oxygen pressure. Surface spin wave propagation has been demonstrated in the in-plane magnetized films.

  1. Structural, morphological, and optoelectrical characterization of Bi2S3 thin films grown by co-evaporation

    NASA Astrophysics Data System (ADS)

    Mesa, F.; Arredondo, C. A.; Vallejo, W.

    2016-03-01

    This work presents the results of synthesis and characterization of polycrystalline n-type Bi2S3 thin films. The films were grown through a chemical reaction from co-evaporation of their precursor elements in a soda-lime glass substrate. The effect of the experimental conditions on the optical, morphological structural properties, the growth rate, and the electrical conductivity (σ) was studied through spectral transmittance, X-ray diffraction (XRD), atomic force microscopy (AFM) and σ versus T measurements, respectively. The results showed that the films grow only in the orthorhombic Bi2S3 bismuthinite phase. It was also found that the Bi2S3 films present an energy band gap (Eg) of about 1.38 eV. In addition to these results, the electrical conductivity of the Bi2S3 films was affected by both the transport of free carriers in extended states of the conduction band and for variable range hopping transport mechanisms, each one predominating in a different temperature range.

  2. Magnetic properties of Sm-Co thin films grown on MgO(100) deposited from a single alloy target

    SciTech Connect

    Verhagen, T. G. A.; Boltje, D. B.; Ruitenbeek, J. M. van; Aarts, J.

    2014-08-07

    We have grown epitaxial Sm-Co thin films by sputter deposition from a single alloy target with a nominal SmCo{sub 5} composition on Cr(100)-buffered MgO(100) single-crystal substrates. By varying the Ar gas pressure, we can change the composition of the film from a SmCo{sub 5}-like to a Sm{sub 2}Co{sub 7}-like phase. The composition, crystal structure, morphology, and magnetic properties of these films have been determined using Rutherford Backscattering, X-ray diffraction, and magnetization measurements. We find that we can grow films with, at room temperature, coercive fields as high as 3.3 T, but with a remanent magnetization which is lower than can be expected from the texturing. This appears to be due to the Sm content of the films, which is higher than expected from the content of the target, even at the lowest possible sputtering pressures. Moreover, we find relatively large variations of film properties using targets of nominally the same composition. At low temperatures, the coercive fields increase, as expected for these hard magnets, but in the magnetization, we observe a strong background signal from the paramagnetic impurities in the MgO substrates.

  3. Effect of different sol concentrations on the properties of nanocrystalline ZnO thin films grown on FTO substrates by sol-gel spin-coating

    NASA Astrophysics Data System (ADS)

    Kim, Ikhyun; Kim, Younggyu; Nam, Giwoong; Kim, Dongwan; Park, Minju; Kim, Haeun; Lee, Wookbin; Leem, Jae-Young; Kim, Jong Su; Kim, Jin Soo

    2014-08-01

    Nanocrystalline ZnO thin films grown on fluorine-doped tinoxide (FTO) substrates were fabricated using the spin-coating method. The structural and the optical properties of the ZnO thin films prepared using different sol concentrations were investigated by using field-emission scanning electron microscopy (FE-SEM), X-ray diffractometry (XRD), photoluminescence (PL) measurements, and ultraviolet-visible (UV-vis) spectrometry. The surface morphology of the ZnO thin films, as observed in the SEM images, exhibited a mountain-chain structure. XRD results indicated that the thin films were preferentially orientated along the direction of the c-axis and that the grain size of the ZnO thin films increased with increasing sol concentration. The PL spectra showed a strong ultraviolet emission peak at 3.22 eV and a broad orange emission peak at 2.0 eV. The intensities of deep-level emission (DLE) gradually increased with increasing sol concentration from 0.4 to 1.0 M. The transmittance spectra of the ZnO thin films showed that the ZnO thin films were transparent (~85%) in the visible region and exhibited sharp absorption edges at 375 nm. Thus, The Urbach energy of ZnO thin films decreased with increasing sol concentration.

  4. Raman evidence of the formation of LT-LiCoO 2 thin layers on NiO in molten carbonate at 650°C

    NASA Astrophysics Data System (ADS)

    Mendoza, L.; Baddour-Hadjean, R.; Cassir, M.; Pereira-Ramos, J. P.

    2004-03-01

    The structural evolution of thin layers of Co 3O 4 elaborated on nickel-based substrates in the Li 2CO 3-Na 2CO 3 carbonate eutectic at 650 °C as a function of time immersion is reported. Raman microspectrometry has been applied in order to provide more information on the nature of the protective cobalt oxide layers. The typical Raman fingerprint of the LT-LiCoO 2 compound has been obtained, with four well defined bands at 449, 484, 590 and 605 cm -1, while XRD data are unable to distinguish the layered phase (HT) from the spinel one (LT). The mechanical stability of such films does not exceed 10 h in direct contact with the molten carbonate bulk at 650 °C; nevertheless, these conditions are much more corrosive than in a molten carbonate fuel cell (MCFC).

  5. Influence of oxygen partial pressure on the structural, optical and electrical properties of Cu-doped NiO thin films

    NASA Astrophysics Data System (ADS)

    Reddy, Y. Ashok Kumar; Sivasankar Reddy, A.; Sreedhara Reddy, P.

    2013-01-01

    The NiO-Cu composite thin films were successfully deposited on Corning 7059 glass substrates at different oxygen partial pressures in the range of 9 × 10-5-6 × 10-4 mbar using the dc reactive magnetron sputtering technique. All the deposited films were of polycrystalline nature and exhibited cubic structure with preferential growth. The optical transmittance and band gap of the films increased with increasing the oxygen partial pressure up to 2 × 10-4 mbar and decreased on further increasing the oxygen partial pressure. From the surface morphological studies, fine and uniform grains were observed at an oxygen partial pressure of 2 × 10-4 mbar. Compositional analysis indicated that Ni content increased and Cu content decreased with increasing the oxygen partial pressure. The resistivity values decreased gradually from 64 to 10 Ω cm with increasing the oxygen pressure to 6 × 10-4 mbar.

  6. Thickness measurement of semiconductor thin films by energy dispersive X-ray fluorescence benchtop instrumentation: Application to GaN epilayers grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Queralt, I.; Ibañez, J.; Marguí, E.; Pujol, J.

    2010-07-01

    The importance of thin films in modern high technology products, such as semiconductors, requires fast and non-destructive analysis. A methodology to determine the thickness of single layers with benchtop energy dispersive X-ray fluorescence (EDXRF) instrumentation is described and tested following analytical validation criteria. The experimental work was carried out on gallium nitride thin films epitaxially grown on sapphire substrate. The results of samples with layers in the range from 400 to 1000 nm exhibit a good correlation with the layer thickness determined by optical reflectance. Spectral data obtained using thin layered samples indicate the possibility to precisely evaluate layer thickness from 5 nm, with a low relative standard deviation (RSD < 2%) of the results. In view of the limits of optical reflectance for very thin layer determination, EDXRF analysis offers the potential for the thickness determination of such kind of samples.

  7. Nanoscale observation of surface potential and carrier transport in Cu2ZnSn(S,Se)4 thin films grown by sputtering-based two-step process

    PubMed Central

    2014-01-01

    Stacked precursors of Cu-Zn-Sn-S were grown by radio frequency sputtering and annealed in a furnace with Se metals to form thin-film solar cell materials of Cu2ZnSn(S,Se)4 (CZTSSe). The samples have different absorber layer thickness of 1 to 2 μm and show conversion efficiencies up to 8.06%. Conductive atomic force microscopy and Kelvin probe force microscopy were used to explore the local electrical properties of the surface of CZTSSe thin films. The high-efficiency CZTSSe thin film exhibits significantly positive bending of surface potential around the grain boundaries. Dominant current paths along the grain boundaries are also observed. The surface electrical parameters of potential and current lead to potential solar cell applications using CZTSSe thin films, which may be an alternative choice of Cu(In,Ga)Se2. PACS number: 08.37.-d; 61.72.Mm; 71.35.-y PMID:24397924

  8. Effect of post-annealing temperature on structural and optical properties of ZnO thin films grown on mica substrates using sol-gel spin-coating

    NASA Astrophysics Data System (ADS)

    Kim, Younggyu; Leem, Jae-Young

    2015-09-01

    ZnO thin films were grown on flexible muscovite mica substrates using sol-gel spin-coating. The structural and optical properties of the sol-gel-derived ZnO thin films annealed at temperatures between 300 - 600 °C were investigated. The surface morphology of the ZnO thin films was found to depend slightly on the annealing temperature. In the photoluminescence spectra, the position of the near-band-edge (NBE) peak was shifted towards a lower energy by the post-annealing process, and the full width at half maximum (FWHM) values of the NBE peaks for the annealed ZnO thin films were significantly lower than those for the as-grown film. Defect-related deep-level peaks exhibiting green and red emissions were observed only for the annealed ZnO thin films. The Urbach energy and optical band gap of the films decreased with an increase in annealing temperatures up to 500 °C.

  9. Surface oxygen exchange properties of Sr doped La2NiO4+δ as SOFC cathode: Thin-film electrical conductivity relaxation investigation

    DOE PAGESBeta

    Guan, Bo; Li, Wenyuan; Zhang, Xinxin; Liu, Xingbo

    2015-06-02

    La2-xSrxNiO4+δ dense films are prepared by a novel spray-modified pressing method. The surface reaction kinetics is investigated via electrical conductivity relaxation (ECR). The layer thickness, 5~10 μm, is much less than the characteristic length of lanthanum nickelates, resulting in surface-controlled situation and allowing more accurate fitting than the traditional pellets ECR on the surface exchange coefficient (k). k for LNO is 1.6×10-5 cm/s in 0.2 atm at 700°C. Sr doping impairs the exchange kinetics, and k of Sr40 is about one order of magnitude smaller than undoped one. Interstitial oxygen and Ni oxidation state are suggested the predominant roles inmore » determining surface kinetics. In conclusion, given the properties of the thin-film herein developed by spray-modified pressing is closer to those in practical porous electrode compared to pulsed laser deposited film in terms of preferential orientation and strain, it warrants the use of such a method in a variety of pertinent investigations.« less

  10. Surface morphology of grown thin films of the quasi one-dimensional organic conductor TTF-TCNQ studied by Atomic Force Microscopy

    NASA Astrophysics Data System (ADS)

    Fraxedas, J.; Caro, J.; Figueras, A.; Gorostiza, P.; Sanz, F.

    1998-01-01

    Thin films of the quasi one-dimensional organic conductor TTF-TCNQ grown on KCl (001) substrates by Chemical Vapor Deposition has been analyzed with Atomic Force Microscopy. The films are polycrystalline, composed of microcrystals with rectangular shape with the c∗ crystallographic axis perpendicular to the substrate. The stepped surface morphology of the microcrystals has been studied. The growth of the films is strongly dominated by an oriented nucleation and the one-dimensional nature of the compound.

  11. An amorphous-to-crystalline phase transition within thin silicon films grown by ultra-high-vacuum evaporation and its impact on the optical response

    NASA Astrophysics Data System (ADS)

    Orapunt, Farida; Tay, Li-Lin; Lockwood, David J.; Baribeau, Jean-Marc; Noël, Mario; Zwinkels, Joanne C.; O'Leary, Stephen K.

    2016-02-01

    A number of thin silicon films are deposited on crystalline silicon, native oxidized crystalline silicon, and optical quality fused quartz substrates through the use of ultra-high-vacuum evaporation at growth temperatures ranging from 98 to 572 °C. An analysis of their grazing incidence X-ray diffraction and Raman spectra indicates that a phase transition, from amorphous-to-crystalline, occurs as the growth temperature is increased. Through a peak decomposition process, applied to the Raman spectroscopy results, the crystalline volume fractions associated with these samples are plotted as a function of the growth temperature for the different substrates considered. It is noted that the samples grown on the crystalline silicon substrates have the lowest crystallanity onset temperature, whereas those grown on the optical quality fused quartz substrates have the highest crystallanity onset temperature; the samples grown on the native oxidized crystalline silicon substrates have a crystallanity onset temperature between these two limits. These resultant dependencies on the growth temperature provide a quantitative means of characterizing the amorphous-to-crystalline phase transition within these thin silicon films. It is noted that the thin silicon film grown on an optical quality fused quartz substrate at 572 °C, possessing an 83% crystalline volume fraction, exhibits an optical absorption spectrum which is quite distinct from that associated with the other thin silicon films. We suggest that this is due to the onset of sufficient long-range order in the film for wave-vector conservation to apply, at least partially. Finally, we use a semi-classical optical absorption analysis to study how this phase transition, from amorphous-to-crystalline, impacts the spectral dependence of the optical absorption coefficient.

  12. Preparation and characterization of lithium thio-germanate thin film electrolytes grown by RF sputtering for solid state lithium-ion batteries

    NASA Astrophysics Data System (ADS)

    Seo, Inseok

    In this study, lithium thio-germanate thin amorphous films were prepared as electrolytes for lithium rechargeable batteries by RF sputtering deposition in Ar atmosphere. The targets for RF sputtering were prepared by milling the appropriate amounts of the starting materials in the nLi2S+GeS 2(n = 1, 2, and 3), Li2GeS3, Li4GeS 4 and Li6GeS5, binary system. The ~1 mum thin film electrolytes were grown onto a variety of substrates using 50 W power and 25 mtorr gas pressure. Films were sputtered in inactive Ar atmospheres. IR, Raman spectroscopy and XRD were used to characterize the chemical bonding and the local structures in the films. XPS spectroscopy was used to further characterize the composition and electronic structures of the films. Ionic conductivity measurements of the electrolyte film using impedance spectroscopy were used to examine the Li2S dependence of the conductivity. The conductivities of the thin films at 25 °C is 1.7 x 10-3 (S/cm). This ionic conductivities of the thin films are two order magnitude higher than oxide thin films (LiPON) which are commercial thin film electrolytes. Therefore, lithium thio-germanate thin film electrolytes are very promising materials for use Li-ion batteries.

  13. Angle-resolved photoemission spectroscopy of strontium lanthanum copper oxide thin films grown by molecular-beam epitaxy

    NASA Astrophysics Data System (ADS)

    Harter, John Wallace

    Among the multitude of known cuprate material families and associated structures, the archetype is "infinite-layer" ACuO2, where perfectly square and flat CuO2 planes are separated by layers of alkaline earth atoms. The infinite-layer structure is free of magnetic rare earth ions, oxygen chains, orthorhombic distortions, incommensurate superstructures, ordered vacancies, and other complications that abound among the other material families. Furthermore, it is the only cuprate that can be made superconducting by both electron and hole doping, making it a potential platform for decoding the complex many-body interactions responsible for high-temperature superconductivity. Research on the infinite-layer compound has been severely hindered by the inability to synthesize bulk single crystals, but recent progress has led to high-quality superconducting thin film samples. Here we report in situ angle-resolved photoemission spectroscopy measurements of epitaxially-stabilized Sr1-chiLa chiCuO2 thin films grown by molecular-beam epitaxy. At low doping, the material exhibits a dispersive lower Hubbard band typical of other cuprate parent compounds. As carriers are added to the system, a continuous evolution from Mott insulator to superconducting metal is observed as a coherent low-energy band develops on top of a concomitant remnant lower Hubbard band, gradually filling in the Mott gap. For chi = 0.10, our results reveal a strong coupling between electrons and (pi,pi) anti-ferromagnetism, inducing a Fermi surface reconstruction that pushes the nodal states below the Fermi level and realizing nodeless superconductivity. Electron diffraction measurements indicate the presence of a surface reconstruction that is consistent with the polar nature of Sr1-chiLachiCuO2. Most knowledge about the electron-doped side of the cuprate phase diagram has been deduced by generalizing from a single material family, Re2-chi CechiCuO4, where robust antiferromagnetism has been observed past chi

  14. MBE Grown In x Ga1- x N Thin Films with Bright Visible Emission Centered at 550 nm

    NASA Astrophysics Data System (ADS)

    Dasari, K.; Thapa, B.; Wang, J.; Wright, J.; Kaya, S.; Jadwisienczak, W. M.; Palai, R.

    2016-04-01

    The In x Ga1- x N thin films with indium content of x = 14-18 at.% were successfully grown by using molecular beam epitaxy (MBE) at high growth temperatures from 650°C to 800°C. In situ reflection high-energy electron diffraction (RHEED) of the In x Ga1- x N films confirmed the Stranski-Krastanov growth mode. X-ray diffraction (XRD) of the films confirmed their highly crystalline nature having c-axis orientation with a small fraction of secondary InN phase admixture. High-resolution cross-sectional scanning electron microscopy images showed two-dimensional epilayers growth with thickness of about ˜260 nm. The high growth temperature of In x Ga1- x N epilayers is found to be favorable to facilitate more GaN phase than InN phase. All the fundamental electronic states of In, Ga, and N were identified by x-ray photoelectron spectroscopy (XPS) and the indium composition has been calculated from the obtained XPS spectra with CASAXPS software. The composition calculations from XRD, XPS and photoluminescence closely match each other. The biaxial strain has been calculated and found to be increasing with the In content. Growing In x Ga1- x N at high temperatures resulted in the reduction in stress/strain which affects the radiative electron-hole pair recombination. The In x Ga1- x N film with lesser strain showed a brighter and stronger green emission than films with the larger built-in strain. A weak S-shaped near band edge emission profile confirms the relatively homogeneous distribution of indium.

  15. Cation Off-Stoichiometry Leads to High p-Type Conductivity and Enhanced Transparency in Co2ZnO4 and Co2NiO4 Thin Films

    SciTech Connect

    Zakutayev, A.; Paudel, T. R.; Ndione, P. F.; Perkins, J. D.; Lany, S.; Zunger, A.; Ginley, D. S.

    2012-02-15

    We explore the effects of cation off-stoichiometry on structural, electrical, optical, and electronic properties of Co{sub 2}ZnO{sub 4} normal spinel and Co{sub 2}NiO{sub 4} inverse spinel using theoretic and experimental (combinatorial and conventional) techniques, both at thermodynamic equilibrium and in the metastable regime. Theory predicts that nonequilibrium substitution of divalent Zn on nominally trivalent octahedral sites increases net hole density in Co{sub 2}ZnO{sub 4}. Experiment confirms high conductivity and high work function in Co{sub 2}NiO{sub 4} and Zn-rich Co{sub 2}ZnO{sub 4} thin films grown by nonequilibrium physical vapor deposition techniques. High p-type conductivities of Co{sub 2}ZnO{sub 4} (up to 5 S/cm) and Co{sub 2}NiO{sub 4} (up to 204 S/cm) are found over a broad compositional range, they are only weakly sensitive to oxygen partial pressure and quite tolerant to a wide range of processing temperatures. In addition, off-stoichiometry caused by nonequilibrium growth decreases the optical absorption of Co{sub 2}ZnO{sub 4} and Co{sub 2}NiO{sub 4} thin films, although the 500-nm thin films still have rather limited transparency. All these properties as well as high work functions make Co{sub 2}ZnO{sub 4} and Co{sub 2}NiO{sub 4} thin films attractive for technological applications, such as hole transport layers in organic photovoltaic devices or p-type buffer layers in inorganic solar cells.

  16. NIO1 diagnostics

    SciTech Connect

    Zaniol, B. Barbisan, M.; Pasqualotto, R.; Serianni, G.; Cavenago, M.; De Muri, M.; Mimo, A.

    2015-04-08

    The radio frequency ion source NIO1, jointly developed by Consorzio RFX and INFN-LNL, will generate a 60kV-135mA hydrogen negative ion beam, composed of 9 beamlets over an area of about 40 × 40 mm{sup 2}. This experiment will operate in continuous mode and in conditions similar to those foreseen for the larger ion sources of the Neutral Beam Injectors for ITER. The modular design of NIO1 is convenient to address the several still open important issues related to beam extraction, optics, and performance optimization. To this purpose a set of diagnostics is being implemented. Electric and water cooling plant related measurements will allow monitoring current, pressure, flow, and temperature. The plasma in the source will be characterized by emission spectroscopy, cavity ring-down and laser absorption spectroscopy. The accelerated beam will be analyzed with a fast emittance scanner, its intensity profile and divergence with beam emission spectroscopy and visible tomography. The power distribution of the beam on the calorimeter will be monitored by thermocouples and by an infrared camera. This contribution presents the implementation and initial operation of some of these diagnostics in the commissioning phase of the experiment, in particular the cooling water calorimetry and emission spectroscopy.

  17. X-ray analysis of strain distribution in two-step grown epitaxial SrTiO{sub 3} thin films

    SciTech Connect

    Panomsuwan, Gasidit E-mail: g.panomsuwan@gmail.com; Takai, Osamu; Saito, Nagahiro

    2014-08-04

    Epitaxial SrTiO{sub 3} (STO) thin films were grown on (001)-oriented LaAlO{sub 3} (LAO) substrates using a two-step growth method by ion beam sputter deposition. An STO buffer layer was initially grown on the LAO substrate at a low temperature of 150 °C prior to growing the STO main layer at 750 °C. The thickness of the STO buffer layer was varied at 3, 6, and 10 nm, while the total film thickness was kept constant at approximately 110 nm. According to x-ray structural analysis, we show that the STO buffer layer plays an essential role in controlling the strain in the STO layer grown subsequently. It is found that the strains in the STO films are more relaxed with an increase in buffer layer thickness. Moreover, the strain distribution in two-step grown STO films becomes more homogeneous across the film thickness when compared to that in directly grown STO film.

  18. Study of the optical properties and structure of ZnSe/ZnO thin films grown by MOCVD with varying thicknesses

    NASA Astrophysics Data System (ADS)

    Jabri, S.; Amiri, G.; Sallet, V.; Souissi, A.; Meftah, A.; Galtier, P.; Oueslati, M.

    2016-05-01

    ZnSe layers were grown on ZnO substrates by the metal organic chemical vapor deposition technique. A new structure appeared at lower thicknesses films. The structural properties of the thin films were studied by the X-ray diffraction (XRD) and Raman spectroscopy methods. First, Raman selection rules are explicitly put forward from a theoretical viewpoint. Second, experimentally-retrieved-intensities of the Raman signal as a function of polarization angle of incident light are fitted to the obtained theoretical dependencies in order to confirm the crystallographic planes of zinc blend ZnSe thin film, and correlate with DRX measurements. Raman spectroscopy has been used to characterize the interfacial disorder that affects energy transport phenomena at ZnSe/ZnO interfaces and the Photoluminescence (PL) near the band edge of ZnSe thin films.

  19. Some optical and electron microscope comparative studies of excimer laser-assisted and nonassisted molecular-beam epitaxically grown thin GaAs films on Si

    NASA Technical Reports Server (NTRS)

    Lao, Pudong; Tang, Wade C.; Rajkumar, K. C.; Guha, S.; Madhukar, A.; Liu, J. K.; Grunthaner, F. J.

    1990-01-01

    The quality of GaAs thin films grown via MBE under pulsed excimer laser irradiation on Si substrates is examined in both laser-irradiated and nonirradiated areas using Raman scattering, Rayleigh scattering, and by photoluminescence (PL), as a function of temperature, and by TEM. The temperature dependence of the PL and Raman peak positions indicates the presence of compressive stress in the thin GaAs films in both laser-irradiated and nonirradiated areas. This indicates incomplete homogeneous strain relaxation by dislocations at the growth temperature. The residual compressive strain at the growth temperature is large enough such that even with the introduction of tensile strain arising from the difference in thermal expansion coefficients of GaAs and Si, a compressive strain is still present at room temperature for these thin GaAs/Si films.

  20. Microstructural and magneto-transport characterization of Bi2SexTe3-x topological insulator thin films grown by pulsed laser deposition method

    NASA Astrophysics Data System (ADS)

    Jin, Zhenghe; Kumar, Raj; Hunte, Frank; Narayan, Jay; Kim, Ki Wook; North Carolina State University Team

    Bi2SexTe3-x topological insulator thin films were grown on Al2O3 (0001) substrate by pulsed laser deposition (PLD). XRD and other structural characterization measurements confirm the growth of the textured Bi2SexTe3-x thin films on Al2O3 substrate. The magneto-transport properties of thick and thin Þlms were investigated to study the effect of thickness on the topological insulator properties of the Bi2SexTe3 - x films. A pronounced semiconducting behavior with a highly insulating ground state was observed in the resistivity vs. temperature data. The presence of the weak anti-localization (WAL) effect with a sharp cusp in the magnetoresistance measurements confirms the 2-D surface transport originating from the TSS in Bi2SexTe3-x TI films. A high fraction of surface transport is observed in the Bi2SexTe3-x TI thin films which decreases in Bi2SexTe3-x TI thick films. The Cosine (θ) dependence of the WAL effect supports the observation of a high proportion of 2-D surface state contribution to overall transport properties of the Bi2SexTe3-x TI thin films. Our results show promise that high quality Bi2SexTe3-x TI thin films with significant surface transport can be grown by PLD method to exploit the exotic properties of the surface transport in future generation spintronic devices. This work was supported, in part, by National Science Foundation ECCS-1306400 and FAME.

  1. Pyroelectric and piezoelectric responses of thin AlN films epitaxy-grown on a SiC/Si substrate

    NASA Astrophysics Data System (ADS)

    Kukushkin, S. A.; Osipov, A. V.; Sergeeva, O. N.; Kiselev, D. A.; Bogomolov, A. A.; Solnyshkin, A. V.; Kaptelov, E. Yu.; Senkevich, S. V.; Pronin, I. P.

    2016-05-01

    This paper presents the results of pyroelectric and piezoelectric studies of AlN films formed by chloride-hydride epitaxy (CHE) and molecular beam epitaxy (MBE) on epitaxial SiC nanolayers grown on Si by the atom substitution method. The surface topography and piezoelectric and pyroelecrtric responses of AlN films have been analyzed. The results of the study have shown that the vertical component of the piezoresponse in CHE-grown AlN films is more homogeneous over the film area than that in MBE-grown AlN films. However, the signal from the MBE-synthesized AlN films proved to be stronger. The inversion of the polar axis (polarization vector) on passage from MBE-grown AlN films to CHE-grown AlN films has been found experimentally. It has been shown that the polar axis in MBE-grown films is directed from the free surface of the film toward the Si substrate while, in CHE-grown films, the polarization vector is directed toward the free surface.

  2. Atomic structure relaxation in nanocrystalline NiO studied by EXAFS spectroscopy: Role of nickel vacancies

    NASA Astrophysics Data System (ADS)

    Anspoks, A.; Kalinko, A.; Kalendarev, R.; Kuzmin, A.

    2012-11-01

    Nanocrystalline NiO samples have been studied using the Ni K-edge extended x-ray absorption fine structure (EXAFS) spectroscopy and recently developed modeling technique, combining classical molecular dynamics with ab initio multiple-scattering EXAFS calculations (MD-EXAFS). Conventional analysis of the EXAFS signals from the first two coordination shells of nickel revealed that (i) the second shell average distance R(Ni-Ni2) expands in nanocrystalline NiO compared to microcrystalline NiO, in agreement with overall unit cell volume expansion observed by x-ray diffraction; (ii) on the contrary, the first shell average distance R(Ni-O1) in nanocrystalline NiO shrinks compared to microcrystalline NiO; (iii) the thermal contribution into the mean-square relative displacement σ2 is close in both microcrystalline and nanocrystalline NiO and can be described by the Debye model; (iv) the static disorder is additionally present in nanocrystalline NiO in both the first Ni-O1 and second Ni-Ni2 shells due to nanocrystal structure relaxation. Within the MD-EXAFS method, the force-field potential models have been developed for nanosized NiO using as a criterion the agreement between the experimental and theoretical EXAFS spectra. The best solutions have been obtained for the 3D cubic-shaped nanoparticle models with nonzero Ni vacancy concentration Cvac: Cvac≈0.4-1.2% for NiO nanoparticles having the cube size of L≈3.6-4.2 nm and Cvac≈1.6-2.0% for NiO thin film composed of cubic nanograins with a size of L≈1.3-2.1 nm. Thus our results show that the Ni vacancies in nanosized NiO play important role in its atomic structure relaxation along with the size reduction effect.

  3. Effect of annealing on M-plane GaN thin films grown by PAMBE on tilt-cut LAO substrate

    NASA Astrophysics Data System (ADS)

    Lin, Yu-Chiao; Lo, Ikai; Wang, Ying-Chieh; Tsai, Cheng-Da; Yang, Chen-Chi; You, Shuo-Ting; Chou, Ming-Chi; Department of Materials and Optoelectronic Science Collaboration

    2014-03-01

    The non-polar GaN thin film is a potential candidate for high-efficient photoelectric devices. In this work, we analyzed the characteristics of M-plane GaN thin films which were grown on tilt-cut LiAlO2 (LAO) substrate by plasma-assisted molecular beam epitaxy (PAMBE). A series of samples were grown with different N/Ga flux ratios. The crystal structure and optical property of GaN samples were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), and photoluminescence (PL) measurements. The peak of 32.2o in the XRD measurement showed the [1100] oriented (M-plane) for the GaN samples. To improve the crystal quality, we performed the thermal treatment by rapid thermal annealing (RTA) system on these samples and analyzed the crystal structure, surface morphology and optical property of the samples after thermal treatment. The effect of annealing on the M-plane GaN thin films was under investigation. This project is supported by National Science council of Taiwan(101-2112-M-110-006-MY3).

  4. Effect of GaN interlayer on polarity control of epitaxial ZnO thin films grown by molecular beam epitaxy

    SciTech Connect

    Wang, X. Q.; Sun, H. P.; Pan, X. Q.

    2010-10-11

    Epitaxial ZnO thin films were grown on nitrided (0001) sapphire substrates with an intervening GaN layer by rf-plasma-assisted molecular beam epitaxy. It was found that polarity of the ZnO epilayer could be controlled by modifying the GaN interlayer. ZnO grown on a distorted 3-nm-thick GaN interlayer has Zn-polarity while ZnO on a 20-nm-thick GaN interlayer with a high structural quality has O-polarity. High resolution transmission electron microscopy analysis indicates that the polarity of ZnO epilayer is controlled by the atomic structure of the interface between the ZnO buffer layer and the intervening GaN layer.

  5. High electron mobility thin-film transistors based on Ga{sub 2}O{sub 3} grown by atmospheric ultrasonic spray pyrolysis at low temperatures

    SciTech Connect

    Thomas, Stuart R. E-mail: thomas.anthopoulos@imperial.ac.uk; Lin, Yen-Hung; Faber, Hendrik; Anthopoulos, Thomas D. E-mail: thomas.anthopoulos@imperial.ac.uk; Adamopoulos, George; Sygellou, Labrini; Stratakis, Emmanuel; Pliatsikas, Nikos; Patsalas, Panos A.

    2014-09-01

    We report on thin-film transistors based on Ga{sub 2}O{sub 3} films grown by ultrasonic spray pyrolysis in ambient atmosphere at 400–450 °C. The elemental, electronic, optical, morphological, structural, and electrical properties of the films and devices were investigated using a range of complementary characterisation techniques, whilst the effects of post deposition annealing at higher temperature (700 °C) were also investigated. Both as-grown and post-deposition annealed Ga{sub 2}O{sub 3} films are found to be slightly oxygen deficient, exceptionally smooth and exhibit a wide energy bandgap of ∼4.9 eV. Transistors based on as-deposited Ga{sub 2}O{sub 3} films show n-type conductivity with the maximum electron mobility of ∼2 cm{sup 2}/V s.

  6. Topological insulator Bi{sub 2}Se{sub 3} thin films grown on double-layer graphene by molecular beam epitaxy

    SciTech Connect

    Song Canli; Jiang Yeping; Chang Cuizu; Xue Qikun; Wang Yilin; Zhang Yi; Wang Lili; He Ke; Fang Zhong; Dai Xi; Xie Xincheng; Ma Xucun; Chen Xi; Jia Jinfeng; Wang Yayu; Qi Xiaoliang; Zhang Shoucheng

    2010-10-04

    Atomically flat thin films of topological insulator Bi{sub 2}Se{sub 3} have been grown on double-layer graphene formed on 6H-SiC(0001) substrate by molecular beam epitaxy. By a combined study of reflection high energy electron diffraction and scanning tunneling microscopy, we identified the Se-rich condition and temperature criterion for layer-by-layer growth of epitaxial Bi{sub 2}Se{sub 3} films. The as-grown films without doping exhibit a low defect density of 1.0{+-}0.2x10{sup 11}/cm{sup 2}, and become a bulk insulator at a thickness of ten quintuple layers, as revealed by in situ angle resolved photoemission spectroscopy measurement.

  7. High-efficiency blue LEDs with thin AlGaN interlayers in InGaN/GaN MQWs grown on Si (111) substrates

    NASA Astrophysics Data System (ADS)

    Kimura, Shigeya; Yoshida, Hisashi; Ito, Toshihide; Okada, Aoi; Uesugi, Kenjiro; Nunoue, Shinya

    2016-02-01

    We demonstrate high-efficiency blue light-emitting diodes (LEDs) with thin AlGaN interlayers in InGaN/GaN multiquantum wells (MQWs) grown on Si (111) substrates. The peak external quantum efficiency (EQE) ηEQE of 82% at room temperature and the hot/cold factor (HCF) of 94% have been obtained by using the functional thin AlGaN interlayers in the MQWs in addition to reducing threading dislocation densities (TDDs) in the blue LEDs. An HCF is defined as ηEQE(85°C)/ηEQE(25°C). The blue LED structures were grown by metal-organic chemical vapor deposition on Si (111) substrates. The MQWs applied as an active layer have 8- pairs of InGaN/AlyGa1-yN/GaN (0<=y<=1) heterostructures. Thinfilm LEDs were fabricated by removing the Si (111) substrates from the grown layers. It is observed by high-resolution transmission electron microscopy and three-dimensional atom probe analysis that the 1 nm-thick AlyGa1-yN interlayers, whose Al content is y=0.3 or less, are continuously formed. EQE and the HCFs of the LEDs with thin Al0.15Ga0.85N interlayers are enhanced compared with those of the samples without the interlayers in the low-current-density region. We consider that the enhancement is due to both the reduction of the nonradiative recombination centers and the increase of the radiative recombination rate mediated by the strain-induced hole carriers indicated by the simulation of the energy band diagram.

  8. Hot-electron mean free path of ErAs thin films grown on GaAs determined by metal-base transistor ballistic electron emission spectroscopy

    NASA Astrophysics Data System (ADS)

    Russell, K. J.; Narayanamurti, V.; Appelbaum, Ian; Hanson, M. P.; Gossard, A. C.

    2006-11-01

    We present an experimental investigation of the hot-electron mean free path in ErAs thin films grown on GaAs. Using an Al/Al2O3/Al tunnel junction as a hot-electron source for ballistic electron emission spectroscopy, we investigate ErAs films of thicknesses ˜100-˜300Å . Our results indicate a mean free path of order 100Å for electrons 1-2eV above the Fermi level at 80K .

  9. Composition dependence of microwave properties of Y-Ba-Cu-O thin films grown by metal-organic chemical-vapor deposition

    NASA Astrophysics Data System (ADS)

    Waffenschmidt, E.; Sjamsudin, G.; Musolf, J.; Arndt, F.; He, X.; Heuken, M.; Heime, K.

    1995-01-01

    Thin film of Y-Ba-Cu-O of different compostition were grown on MgO and LaAlO3 substrates by metal-organic chemical-vapor deposition. Using a microwave cavity resonator, their microwave surface resistance at 24.5 GHz was measured at a temperature of 77.5 K. It varies from less than 3 mOmega to more than 50 mOmega depending on the composition of the films. The lowest surface resistances could be obtained with samples having a composition close to the ideal stoichiometry 1:2:3 but with a slight excess of copper and yttrium.

  10. Positive magnetoresistance in ferromagnetic Nd-doped In{sub 2}O{sub 3} thin films grown by pulse laser deposition

    SciTech Connect

    Xing, G. Z. Yi, J. B.; Li, S.; Yan, F.; Wu, T.

    2014-05-19

    We report the magnetic and magnetotransport properties of (In{sub 0.985}Nd{sub 0.015}){sub 2}O{sub 2.89} thin films grown by pulse laser deposition. The clear magnetization hysteresis loops with the complementary magnetic domain structure reveal the intrinsic room temperature ferromagnetism in the as-prepared films. The strong sp-f exchange interaction as a result of the rare earth doping is discussed as the origin of the magnetotransport behaviours. A positive magnetoresistance (∼29.2%) was observed at 5 K and ascribed to the strong ferromagnetic sp-f exchange interaction in (In{sub 0.985}Nd{sub 0.015}){sub 2}O{sub 2.89} thin films due to a large Zeeman splitting in an external magnetic field of 50 KOe.

  11. Microstructure of Co/X (X=Cu,Ag,Au) epitaxial thin films grown on Al{sub 2}O{sub 3}(0001) substrates

    SciTech Connect

    Ohtake, Mitsuru; Akita, Yuta; Futamoto, Masaaki; Kirino, Fumiyoshi

    2007-05-01

    Epitaxial thin films of Co/X (X=Cu,Ag,Au) were prepared on Al{sub 2}O{sub 3}(0001) substrates at substrate temperatures of 100 and 300 degree sign C by UHV molecular beam epitaxy. A complicated microstructure was realized for the epitaxial thin films. In-situ reflection high-energy electron diffraction observation has shown that X atoms of the buffer layer segregated to the surface during Co layer deposition, and it yielded a unique epitaxial granular structure. The structure consists of small Co grains buried in the X buffer layer, where both the magnetic small Co grains and the nonmagnetic X layer are epitaxially grown on the single crystal substrate. The structure varied depending on the X element and the substrate temperature. The crystal structure of Co grains is influenced by the buffer layer material and determined to be hcp and fcc structures for the buffer layer materials of Au and Cu, respectively.

  12. Direct observation of fatigue in epitaxially grown Pb(Zr,Ti)O3 thin films using second harmonic piezoresponse force microscopy

    SciTech Connect

    Murari, Nishit M; Hong, Seungbum; Lee, Ho Nyung; Katiyar, Ram S.

    2011-01-01

    Here, we present a direct observation of fatigue phenomena in epitaxially grown Pb(Zr{sub 0.2}Ti{sub 0.8})O{sub 3} (PZT) thin films using second harmonic piezoresponse force microscopy (SH-PFM). We observed strong correlation between the SH-PFM amplitude and phase signals with the remnant piezoresponse at different switching cycles. The SH-PFM results indicate that the average fraction of switchable domains decreases globally and the phase delays of polarization switching differ locally. In addition, we found that the fatigue developed uniformly over the whole area without developing region-by-region suppression of switchable polarization as in polycrystalline PZT thin films.

  13. Data storage applications based on LiCoO2 thin films grown on Al2O3 and Si substrates

    NASA Astrophysics Data System (ADS)

    Svoukis, E.; Mihailescu, C. N.; Mai, V. H.; Schneegans, O.; Breza, K.; Lioutas, C.; Giapintzakis, J.

    2016-09-01

    In this study, LiCoO2 thin films were investigated for data storage applications based on scanning probe mediated approaches. LiCoO2, compared to other materials proposed for scanning probe mediated nanoscale patterning, is highly stable and exhibits reversible electrochemical surface modifications. LiCoO2 thin films have been grown by pulsed laser deposition on Al2O3 and Si substrates over a range of deposition temperatures. The crystal structure and the microstructure of the films has been inferred through in- and out-of-plane X-ray diffraction studies and high-resolution transmission electron microscopy, respectively. The influence of the film deposition temperature on the surface electrical properties of the LiCoO2 films is discussed along with the relevant mechanism of surface resistance modification.

  14. Detection of Fe2+ valence states in Fe doped SrTiO3 epitaxial thin films grown by pulsed laser deposition.

    PubMed

    Koehl, Annemarie; Kajewski, Dariusz; Kubacki, Jerzy; Lenser, Christian; Dittmann, Regina; Meuffels, Paul; Szot, Kristof; Waser, Rainer; Szade, Jacek

    2013-06-01

    We present an X-ray absorption spectroscopy study on Fe-doped SrTiO3 thin films grown by pulsed laser deposition. The Fe L2,3 edge spectra are recorded for doping concentrations from 0-5% after several annealing steps at moderate temperatures. The Fe valence state is determined by comparison with an ilmenite reference sample and calculations according to the charge transfer multiplet model. We found clear evidence of Fe(2+) and Fe(3+) oxidation states independently of the doping concentration. The Fe(2+) signal is enhanced at the surface and increases after annealing. The Fe(2+) configuration is in contrast to the mixed Fe(3+)/Fe(4+) valence state in bulk material and must be explained by the specific defect structure of the thin films due to the kinetically limited growth which induces a high concentration of oxygen vacancies. PMID:23615619

  15. Co{sub 2}FeAl Heusler thin films grown on Si and MgO substrates: Annealing temperature effect

    SciTech Connect

    Belmeguenai, M. Tuzcuoglu, H.; Zighem, F.; Chérif, S. M.; Moch, P.; Gabor, M. S. Petrisor, T.; Tiusan, C.

    2014-01-28

    10 nm and 50 nm Co{sub 2}FeAl (CFA) thin films have been deposited on MgO(001) and Si(001) substrates by magnetron sputtering and annealed at different temperatures. X-rays diffraction revealed polycrystalline or epitaxial growth (according to CFA(001)[110]//MgO(001)[100] epitaxial relation) for CFA films grown on a Si and on a MgO substrate, respectively. For these later, the chemical order varies from the A2 phase to the B2 phase when increasing the annealing temperature (T{sub a}), while only the A2 disorder type has been observed for CFA grown on Si. Microstrip ferromagnetic resonance (MS-FMR) measurements revealed that the in-plane anisotropy results from the superposition of a uniaxial and a fourfold symmetry term for CFA grown on MgO substrates. This fourfold anisotropy, which disappears completely for samples grown on Si, is in accord with the crystal structure of the samples. The fourfold anisotropy field decreases when increasing T{sub a}, while the uniaxial anisotropy field is nearly unaffected by T{sub a} within the investigated range. The MS-FMR data also allow for concluding that the gyromagnetic factor remains constant and that the exchange stiffness constant increases with T{sub a}. Finally, the FMR linewidth decreases when increasing T{sub a}, due to the enhancement of the chemical order. We derive a very low intrinsic damping parameter (1.1×10{sup −3} and 1.3×10{sup −3} for films of 50 nm thickness annealed at 615 °C grown on MgO and on Si, respectively)

  16. Optical properties of epitaxial BiFeO3 thin film grown on SrRuO3-buffered SrTiO3 substrate

    PubMed Central

    2014-01-01

    The BiFeO3 (BFO) thin film was deposited by pulsed-laser deposition on SrRuO3 (SRO)-buffered (111) SrTiO3 (STO) substrate. X-ray diffraction pattern reveals a well-grown epitaxial BFO thin film. Atomic force microscopy study indicates that the BFO film is rather dense with a smooth surface. The ellipsometric spectra of the STO substrate, the SRO buffer layer, and the BFO thin film were measured, respectively, in the photon energy range 1.55 to 5.40 eV. Following the dielectric functions of STO and SRO, the ones of BFO described by the Lorentz model are received by fitting the spectra data to a five-medium optical model consisting of a semi-infinite STO substrate/SRO layer/BFO film/surface roughness/air ambient structure. The thickness and the optical constants of the BFO film are obtained. Then a direct bandgap is calculated at 2.68 eV, which is believed to be influenced by near-bandgap transitions. Compared to BFO films on other substrates, the dependence of the bandgap for the BFO thin film on in-plane compressive strain from epitaxial structure is received. Moreover, the bandgap and the transition revealed by the Lorentz model also provide a ground for the assessment of the bandgap for BFO single crystals. PMID:24791162

  17. Optical properties of epitaxial BiFeO3 thin film grown on SrRuO3-buffered SrTiO3 substrate.

    PubMed

    Xu, Ji-Ping; Zhang, Rong-Jun; Chen, Zhi-Hui; Wang, Zi-Yi; Zhang, Fan; Yu, Xiang; Jiang, An-Quan; Zheng, Yu-Xiang; Wang, Song-You; Chen, Liang-Yao

    2014-01-01

    The BiFeO3 (BFO) thin film was deposited by pulsed-laser deposition on SrRuO3 (SRO)-buffered (111) SrTiO3 (STO) substrate. X-ray diffraction pattern reveals a well-grown epitaxial BFO thin film. Atomic force microscopy study indicates that the BFO film is rather dense with a smooth surface. The ellipsometric spectra of the STO substrate, the SRO buffer layer, and the BFO thin film were measured, respectively, in the photon energy range 1.55 to 5.40 eV. Following the dielectric functions of STO and SRO, the ones of BFO described by the Lorentz model are received by fitting the spectra data to a five-medium optical model consisting of a semi-infinite STO substrate/SRO layer/BFO film/surface roughness/air ambient structure. The thickness and the optical constants of the BFO film are obtained. Then a direct bandgap is calculated at 2.68 eV, which is believed to be influenced by near-bandgap transitions. Compared to BFO films on other substrates, the dependence of the bandgap for the BFO thin film on in-plane compressive strain from epitaxial structure is received. Moreover, the bandgap and the transition revealed by the Lorentz model also provide a ground for the assessment of the bandgap for BFO single crystals. PMID:24791162

  18. A bow-tie photoconductive antenna using a low-temperature-grown GaAs thin-film on a silicon substrate for terahertz wave generation and detection

    NASA Astrophysics Data System (ADS)

    Darío Velásquez Ríos, Rubén; Bikorimana, Siméon; Ummy, Muhammad Ali; Dorsinville, Roger; Seo, Sang-Woo

    2015-12-01

    This paper presents heterogeneously integrated bow-tie emitter-detector photoconductive antennas (PCAs) based on low-temperature grown-gallium arsenide (LTG-GaAs) thin-film devices on silicon-dioxide/silicon (SiO2/Si) host substrates for integrated terahertz (THz) systems. The LTG-GaAs thin-film devices are fabricated with standard photolithography and thermal evaporation of metal-contact layers of chromium (Cr), nickel (Ni) and gold (Au). They are etched selectively and separated from their growth GaAs substrate. The LTG-GaAs thin-film devices are then heterogeneously integrated on bow-tie antenna electrodes patterned on the surface of a SiO2/Si host substrate for THz emitters and THz detectors. Cost-effective and selective integration of LTG-GaAs thin-film devices on a Si platform is demonstrated. THz radiation from the fabricated THz PCAs is successfully measured using a pump-probe THz time-domain configuration. The THz temporal duration was measured at full width half maximum of 0.36 ps. Its frequency spectrum exhibits a broadband response with a peak resonant frequency of about 0.31 THz. The demonstration illustrates the feasibility of creating heterogeneously integrated THz systems using separately optimized LTG-GaAs devices and Si based electronics.

  19. Evolution of morphology and structure of Pb thin films grown by pulsed laser deposition at different substrate temperatures

    SciTech Connect

    Lorusso, Antonella Maiolo, Berlinda; Perrone, Alessio; Gontad, Francisco; Maruccio, Giuseppe; Tasco, Vittorianna

    2014-03-15

    Pb thin films were prepared by pulsed laser deposition on a Si (100) substrate at different growth temperatures to investigate their morphology and structure. The morphological analysis of the thin metal films showed the formation of spherical submicrometer grains whose average size decreased with temperature. X-ray diffraction measurements confirmed that growth temperature influences the Pb polycrystalline film structure. A preferred orientation of Pb (111) normal to the substrate was achieved at 30 °C and became increasingly pronounced along the Pb (200) plane as the substrate temperature increased. These thin films could be used to synthesize innovative materials, such as metallic photocathodes, with improved photoemission performances.

  20. Nano-indentation of single-layer optical oxide thin films grown by electron-beam deposition

    SciTech Connect

    Mehrotra, K.; Oliver, J. B.; Lambropoulos, J. C.

    2015-01-01

    Mechanical characterization of optical oxide thin films is performed using nano-indentation, and the results are explained based on the deposition conditions used. These oxide films are generally deposited to have a porous microstructure that optimizes laser induced damage thresholds, but changes in deposition conditions lead to varying degrees of porosity, density, and possibly the microstructure of the thin film. This can directly explain the differences in the mechanical properties of the film studied here and those reported in literature. Of the four single-layer thin films tested, alumina was observed to demonstrate the highest values of nano-indentation hardness and elastic modulus. This is likely a result of the dense microstructure of the thin film arising from the particular deposition conditions used.

  1. Characterization of high-κ LaLuO3 thin film grown on AlGaN/GaN heterostructure by molecular beam deposition

    NASA Astrophysics Data System (ADS)

    Yang, Shu; Huang, Sen; Chen, Hongwei; Schnee, Michael; Zhao, Qing-Tai; Schubert, Jürgen; Chen, Kevin J.

    2011-10-01

    We report the study of high-dielectric-constant (high-κ) dielectric LaLuO3 (LLO) thin film that is grown on AlGaN/GaN heterostructure by molecular beam deposition (MBD). The physical properties of LLO on AlGaN/GaN heterostrucure have been investigated with atomic force microscopy, x-ray photoelectron spectroscopy, and TEM. It is revealed that the MBD-grown 16 nm-thick LLO film is polycrystalline with a thin (˜2 nm) amorphous transition layer at the LLO/GaN interface. The bandgap of LLO is derived as 5.3 ± 0.04 eV from O1s energy loss spectrum. Capacitance-voltage (C-V) characteristics of a Ni-Au/LLO/III-nitride metal-insulator-semiconductor diode exhibit small frequency dispersion (<2%) and reveal a high effective dielectric constant of ˜28 for the LLO film. The LLO layer is shown to be effective in suppressing the reverse and forward leakage current in the MIS diode. In particular, the MIS diode forward current is reduced by 7 orders of magnitude at a forward bias of 1 V compared to a conventional Ni-Au/III-nitride Schottky diode.

  2. Off-centered polarization and ferroelectric phase transition in Li-doped ZnO thin films grown by pulsed-laser ablation

    NASA Astrophysics Data System (ADS)

    Dhananjay, Nagaraju, J.; Krupanidhi, S. B.

    2007-05-01

    Li-doped ZnO (Zn1-xLixO, x=0.15) thin films have been grown on platinum-coated silicon substrates via pulsed-laser ablation. The films were grown at fixed substrate temperature of 500 °C and different partial pressure of oxygen (PO2˜100-300 mTorr). The films showed (002) preferred orientation. The doping concentration and built-in potential were estimated from the capacitance-voltage characteristics. In order to investigate the phase transition behavior of the films, dc conductivity and dielectric measurements were conducted. The phase transition temperature was found to be 330 K. The activation energy (dc) has been found to be 0.05 and 0.28 eV in ferroelectric and paraelectric phases, respectively. The Zn0.85Li015O thin films exhibited well-defined polarization hysteresis loop, with a remanent polarization of 0.2 μC/cm2 and coercive field of 25 kV/cm, at room temperature. The conduction mechanism of the laser ablated Zn0.85Li015O films was analyzed in the light of impedance spectroscopy.

  3. A photoluminescence comparison of CdTe thin films grown by molecular-beam epitaxy, metalorganic chemical vapor deposition, and sputtering in ultrahigh vacuum

    NASA Astrophysics Data System (ADS)

    Feng, Z. C.; Bevan, M. J.; Krishnaswamy, S. V.; Choyke, W. J.

    1988-09-01

    High perfection CdTe thin films have been grown on (001) InSb and CdTe substrates by molecular-beam epitaxy, metalorganic chemical vapor deposition (MOCVD), and sputtering in ultrahigh vacuum techniques. The quality of the as-grown CdTe films are characterized by 2-K photoluminescence. The spectra show strong and sharp exciton transitions and weak 1.40-1.50-eV defect-related bands. Radiative defect densities of lower than 0.002 are realized. High-resolution spectroscopy shows that the full width at half maximum of the principal bound exciton lines is about 0.1 meV. Such small ρ values and narrow photoluminescence lines have not been previously reported. The largest luminescence efficiency is observed for MOCVD-CdTe films grown on CdTe substrates. A variety of impurities appear to be responsible for the observed radiative transitions in these three kinds of CdTe films. We attempt to assign the observed impurity related lines by a comparison with ``known'' impurities in bulk CdTe spectra given in the literature.

  4. p-type conduction from Sb-doped ZnO thin films grown by dual ion beam sputtering in the absence of oxygen ambient

    SciTech Connect

    Kumar Pandey, Sushil; Kumar Pandey, Saurabh; Awasthi, Vishnu; Kumar, Ashish; Mukherjee, Shaibal; Deshpande, Uday P.; Gupta, Mukul

    2013-10-28

    Sb-doped ZnO (SZO) thin films were deposited on c-plane sapphire substrates by dual ion beam sputtering deposition system in the absence of oxygen ambient. The electrical, structural, morphological, and elemental properties of SZO thin films were studied for films grown at different substrate temperatures ranging from 200 °C to 600 °C and then annealed in situ at 800 °C under vacuum (pressure ∼5 × 10{sup −8} mbar). Films grown for temperature range of 200–500 °C showed p-type conduction with hole concentration of 1.374 × 10{sup 16} to 5.538 × 10{sup 16} cm{sup −3}, resistivity of 66.733–12.758 Ω cm, and carrier mobility of 4.964–8.846 cm{sup 2} V{sup −1} s{sup −1} at room temperature. However, the film grown at 600 °C showed n-type behavior. Additionally, current-voltage (I–V) characteristic of p-ZnO/n-Si heterojunction showed a diode-like behavior, and that further confirmed the p-type conduction in ZnO by Sb doping. X-ray diffraction measurements showed that all SZO films had (002) preferred crystal orientation. X-ray photoelectron spectroscopy analysis confirmed the formation of Sb{sub Zn}–2V{sub Zn} complex caused acceptor-like behavior in SZO films.

  5. Residual and intentional n-type doping of ZnO thin films grown by metal-organic vapor phase epitaxy on sapphire and ZnO substrates

    NASA Astrophysics Data System (ADS)

    Brochen, Stéphane; Lafossas, Matthieu; Robin, Ivan-Christophe; Ferret, Pierre; Gemain, Frédérique; Pernot, Julien; Feuillet, Guy

    2014-03-01

    ZnO epilayers usually exhibit high n-type residual doping which is one of the reasons behind the difficulties to dope this material p-type. In this work, we aimed at determining the nature of the involved impurities and their potential role as dopant in ZnO thin films grown by metalorganic vapor phase epitaxy (MOVPE) on sapphire and ZnO substrates. In both cases, secondary ion mass spectroscopy (SIMS) measurements give evidence for a strong diffusion of impurities from the substrate to the epilayer, especially for silicon and aluminum. In the case of samples grown on sapphire substrates, aluminum follows Fick's diffusion law on a wide growth temperature range (800-1000°C). Thus, the saturation solubility and the diffusion coefficient of aluminum in ZnO single crystals have been determined. Furthermore, the comparison between SIMS impurity and effective dopant concentrations determined by capacitance-voltage measurements highlights, on one hand a substitutional mechanism for aluminum diffusion, and on the other hand that silicon acts as a donor in ZnO and not as an amphoteric impurity. In addition, photoluminescence spectra exhibit excitonic recombinations at the same energy for aluminum and silicon, indicating that silicon behaves as an hydrogenic donor in ZnO. Based on these experimental observations, ZnO thin films with a controlled n-type doping in the 1016-1019cm-3 range have been carried out. These results show that MOVPE growth is fully compatible with the achievement of highly Al-doped n-type thin films, but also with the growth of materials with low residual doping, which is a crucial parameter to address ZnO p-type doping issues.

  6. Preparation and structure characterization of SmCo{sub 5}(0001) epitaxial thin films grown on Cu(111) underlayers

    SciTech Connect

    Ohtake, Mitsuru; Nukaga, Yuri; Futamoto, Masaaki; Kirino, Fumiyoshi

    2009-04-01

    SmCo{sub 5}(0001) epitaxial films were prepared on Cu(111) single-crystal underlayers formed on Al{sub 2}O{sub 3}(0001) substrates at 500 deg. C. The nucleation and growth mechanism of (0001)-oriented SmCo{sub 5} crystal on Cu(111) underlayer is investigated and a method to control the nucleation is proposed. The SmCo{sub 5} epitaxial thin film formed directly on Cu underlayer consists of two types of domains whose orientations are rotated around the film normal by 30 deg. each other. By introducing a thin Co seed layer on the Cu underlayer, a SmCo{sub 5}(0001) single-crystal thin film is successfully obtained. Nucleation of SmCo{sub 5} crystal on Cu underlayer seems controllable by varying the interaction between the Cu underlayer and the SmCo{sub 5} layer.

  7. Azo-derivatives thin films grown by matrix-assisted pulsed laser evaporation for non-linear optical applications

    NASA Astrophysics Data System (ADS)

    Constantinescu, C.; Matei, A.; Ionita, I.; Ion, V.; Marascu, V.; Dinescu, M.; Vasiliu, C.; Emandi, A.

    2014-05-01

    Azo-dye compounds, in bulk or as thin films, are extensively studied due to their particular optical properties. These properties include non-linear interaction, e.g. two-photon absorption, optical limiting and all-optical poling, with potential applications in optoelectronics and sensors development. Herein, we report on the deposition of pyrazolone derivatives, namely 1-phenyl-3-methyl-4-(1‧-azo-2‧-sodium carboxylate)-pyrazole-5-one thin films, for applications in second harmonic generation. Matrix-assisted pulsed laser evaporation was employed for layers growth, using a Nd:YAG device operating at 266 nm (4ω). The structure and surface morphology of the deposited films were examined by Fourier transform infrared spectroscopy, atomic force microscopy, and scanning electron microscopy. Spectroscopic-ellipsometry was employed to investigate thin film optical properties. Significant second harmonic generation capabilities of the compound were pointed out by using a femtosecond Ti:sapphire laser.

  8. Graphite Thin Films Consisting of Nanograins of Multilayer Graphene on Sapphire Substrates Directly Grown by Alcohol Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Miyasaka, Yuta; Nakamura, Atsushi; Temmyo, Jiro

    2011-04-01

    Graphene has been attracting a strong interest as a transparent electrode as well as a THz nanoelectronic device owing to its unique properties. To date, large-area graphene growth has been realized by chemical vapor deposition (CVD) with a catalyst metal. To avoid the transfer of segregated graphene, we have examined directly graphite thin film growth on nonpolar a-sapphire substrates without any catalyst metal by alcohol CVD. Graphite thin films consisting of nanograins of multilayer graphene on a-sapphire substrates were verified by a combination of transmission electron spectroscopy (TEM), and Raman analyses, and optical transparent and sheet resistance measurements.

  9. Characterization of deep acceptor level in as-grown ZnO thin film by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Asghar, M.; K., Mahmood; A. Hasan, M.; T. Ferguson, I.; Tsu, R.; Willander, M.

    2014-09-01

    We report deep level transient spectroscopy results from ZnO layers grown on silicon by molecular beam epitaxy (MBE). The hot probe measurements reveal mixed conductivity in the as-grown ZnO layers, and the current—voltage (I—V) measurements demonstrate a good quality p-type Schottky device. A new deep acceptor level is observed in the ZnO layer having activation energy of 0.49 ±0.03 eV and capture cross-section of 8.57 × 10-18 cm2. Based on the results from Raman spectroscopy, photoluminescence, and secondary ion mass spectroscopy (SIMS) of the ZnO layer, the observed acceptor trap level is tentatively attributed to a nitrogen-zinc vacancy complex in ZnO.

  10. Magnetotransport phenomena in Bi{sub 2}Se{sub 3} thin film topological insulators grown by hybrid physical chemical vapor deposition

    SciTech Connect

    Kumar, Raj; Hunte, Frank; Brom, Joseph E.; Redwing, Joan M.

    2015-02-14

    Intrinsic defects in Bi{sub 2}Se{sub 3} topological insulators tend to produce a high carrier concentration and current leakage through the bulk material. Bi{sub 2}Se{sub 3} thin films were grown by hybrid physical chemical vapor deposition on (0001) Al{sub 2}O{sub 3} substrates with high Se vapor pressure to reduce the occurrence of Se vacancies as the main type of defect. Consequently, the carrier concentration was reduced to ∼5.75 × 10{sup 18} cm{sup −3} comparable to reported carrier concentration in Bi{sub 2}Se{sub 3} thin films. Magnetotransport measurements were performed on the films and the data were analyzed for weak anti-localization using the Hikami-Larkin-Nagaoka model. The estimated α and l{sub ϕ} values showed good agreement with the symplectic case of 2-D transport of topological surface states in the quantum diffusion regime. The temperature and angular dependence of magnetoresistance indicate a large contribution of the 2-D surface carriers to overall transport properties of Bi{sub 2}Se{sub 3} thin film.

  11. Electron microscopy study of MOCVD-grown TiO sub 2 thin films and TiO sub 2 /Al sub 2 O sub 3 interfaces

    SciTech Connect

    Gao, Y.; Merkle, K.L.; Chang, H.L.M.; Zhang, T.J.; Lam, D. J.

    1990-11-01

    TiO{sub 2} thin films grown on (11{bar 2}0) sapphire at 800{degree}C by the MOCVD technique have been characterized by transmission electron microscopy. The TiO{sub 2} thin films are single crystalline and have the rutile structure. The epitaxial orientation relationship between the TiO{sub 2} thin films (R) and the substrate (S) has been found to be: (101)(0{bar 1}0){sub R}{parallel}(11{bar 2}0)(0001){sub S}. Growth twins in the films are commonly observed with the twin plane {l brace}101{r brace} and twinning direction {l angle}011{r angle}. Detailed atomic structures of the twin boundaries and TiO{sub 2}/{alpha}-Al{sub 2}O{sub 3} interfaces have been investigated by high-resolution electron microscopy (HREM). When the interfaces are viewed in the direction of (0{bar 1}0){sub R}/(0001){sub S}, the interfaces are found to be structurally coherent in the direction of ({bar 1}01){sub R}/(1{bar 1}00){sub S}, in which the lattice mismatch at the interfaces is about 0.5%. 8 refs., 4 figs.

  12. Interaction of oxygen with samarium on Al{sub 2}O{sub 3} thin film grown on Ni{sub 3}Al(111)

    SciTech Connect

    Cheng, Dingling; Xu, Qian E-mail: jfzhu@ustc.edu.cn; Han, Yong; Ye, Yifan; Pan, Haibin; Zhu, Junfa E-mail: jfzhu@ustc.edu.cn

    2014-03-07

    The interaction between oxygen and samarium (Sm) on the well-ordered thin Al{sub 2}O{sub 3} film grown on Ni{sub 3}Al(111) has been investigated by X-ray photoelectron spectroscopy and synchrotron radiation photoemission spectroscopy. At Sm coverage higher than one monolayer, exposure of oxygen to the Sm films at room temperature leads to the formation of both samarium peroxide (O{sub 2}{sup 2−}) states and regular samarium oxide (O{sup 2−}) states. By contrast, when exposing O{sub 2} to Sm film less than one monolayer on Al{sub 2}O{sub 3}, no O{sub 2}{sup 2−} can be observed. Upon heating to higher temperatures, these metastable O{sub 2}{sup 2−} states dissociate, supplying active O atoms which can diffuse through the Al{sub 2}O{sub 3} thin film to further oxidize the underlying Ni{sub 3}Al(111) substrate, leading to the significant increase of the Al{sub 2}O{sub 3} thin film thickness. Therefore, it can be concluded that Sm, presumably in its peroxide form, acts as a catalyst for the further oxidation of the Ni{sub 3}Al substrate by supplying the active oxygen species at elevated temperatures.

  13. On the dielectric and optical properties of surface-anchored metal-organic frameworks: A study on epitaxially grown thin films

    NASA Astrophysics Data System (ADS)

    Redel, Engelbert; Wang, Zhengbang; Walheim, Stefan; Liu, Jinxuan; Gliemann, Hartmut; Wöll, Christof

    2013-08-01

    We determine the optical constants of two highly porous, crystalline metal-organic frameworks (MOFs). Since it is problematic to determine the optical constants for the standard powder modification of these porous solids, we instead use surface-anchored metal-organic frameworks (SURMOFs). These MOF thin films are grown using liquid phase epitaxy (LPE) on modified silicon substrates. The produced SURMOF thin films exhibit good optical properties; these porous coatings are smooth as well as crack-free, they do not scatter visible light, and they have a homogenous interference color over the entire sample. Therefore, spectroscopic ellipsometry (SE) can be used in a straightforward fashion to determine the corresponding SURMOF optical properties. After careful removal of the solvent molecules used in the fabrication process as well as the residual water adsorbed in the voids of this highly porous solid, we determine an optical constant of n = 1.39 at a wavelength of 750 nm for HKUST-1 (stands for Hong Kong University of Science and Technology-1; and was first discovered there) or [Cu3(BTC)2]. After exposing these SURMOF thin films to moisture/EtOH atmosphere, the refractive index (n) increases to n = 1.55-1.6. This dependence of the optical properties on water/EtOH adsorption demonstrates the potential of such SURMOF materials for optical sensing.

  14. Numerical analysis on the origin of thickness unevenness and formation of pits at GaN thin film grown by HVPE

    NASA Astrophysics Data System (ADS)

    Han, Xue-Feng; Lee, Jae-Hak; Lee, Yoo-Jin; Song, Jae-Ho; Yi, Kyung-Woo

    2016-09-01

    In this study, we propose a 3D model for analyzing the fluid flow, mass fractions of reacting gases, GaN deposition thickness distribution and V/III ratio distribution at the GaN deposition surface in the multi-susceptor HVPE equipment. The GaN thin film is grown in the multi-susceptor HVPE equipment at 1213 K and 1 bar. The deposition thickness distribution from the calculation has been compared with the experimental results. Moreover, the standard deviations of deposition thickness of the films achieved from calculations and experiments have been compared. Besides, in the calculation results, we found that the V/III ratio at the GaN deposition surface increased from the center to the periphery and from low susceptor to high susceptor. Our calculation results have also been verified by 3D measuring laser microscope observation of the surface morphology of the GaN thin film. In according with the calculation results, the density of the pits also decreases from the center to the periphery as well as from low susceptor to high susceptor, demonstrating that the pit density at the surface of the GaN thin films could be reduced when the V/III ratio is increased.

  15. Effect of Li substitution on dielectric and ferroelectric properties of ZnO thin films grown by pulsed-laser ablation

    NASA Astrophysics Data System (ADS)

    Dhananjay; Nagaraju, J.; Krupanidhi, S. B.

    2006-02-01

    Li-doped ZnO thin films (Zn1-xLixO, x=0.05-0.15) were grown by pulsed-laser ablation technique. Highly c-axis-oriented films were obtained at a growth temperature of 500 °C. Ferroelectricity in Zn1-xLixO was found from the temperature-dependent dielectric constant and from the polarization hysteresis loop. The transition temperature (Tc) varied from 290 to 330 K as the Li concentration increased from 0.05 to 0.15. It was found that the maximum value of the dielectric constant at Tc is a function of Li concentration. A symmetric increase in memory window with the applied gate voltage is observed for the ferroelectric thin films on a p-type Si substrate. A ferroelectric P-E hysteresis loop was observed for all the compositions. The spontaneous polarization (Ps) and coercive field (Ec) of 0.6 μC/cm2 and 45 kV/cm were obtained for Zn0.85Li0.15O thin films. These observations reveal that partial replacement of host Zn by Li ions induces a ferroelectric phase in the wurtzite-ZnO semiconductor. The dc transport studies revealed an Ohmic behavior in the lower-voltage region and space-charge-limited conduction prevailed at higher voltages. The optical constants were evaluated from the transmission spectrum and it was found that Li substitution in ZnO enhances the dielectric constant.

  16. Spectroscopic Ellipsometry of 3C-SiC Thin Films Grown on Si Substrates Using Organosilane Sources

    NASA Astrophysics Data System (ADS)

    Kubo, Naoki; Moritani, Akihiro; Kitahara, Kuninori; Asahina, Shuichi; Kanayama, Nobuyuki; Tsutsumi, Koichi; Suzuki, Michio; Nishino, Shigehiro

    2005-06-01

    Dielectric function spectra of 3C-SiC films on Si substrates in the energy region of 0.73-6.43 eV were measured by spectroscopic ellipsometry. Hexamethyldisilane (Si2(CH3)6) and tetraethylsilane (Si(C2H5)4) were used as safe organosilane sources for the growth of SiC films. The measured spectra were compared with those of 3C-SiC on a Si(001) substrate grown with disilane (Si2H6). First, the pseudodielectric function spectra gave a shoulder structure corresponding to the direct X5-X1 interband transition in the Brillouin zone. Secondly, the dielectric function of 3C-SiC was determined by applying a four-layer model in which we took into account the surface roughness and mixed crystals of a carbonized interface layer. Finally, the third-derivative lineshape of the imaginary part \\varepsilon2 of the complex-dielectric function provided the values of the interband transition energy Eg and the broadening parameter Γ for the X5-X1 interband transition. The measured values of Γ indicated that the crystalline quality of SiC films grown using organosilane sources is comparable to that of SiC films grown using Si2H6.

  17. Characteristics of Fluorine-doped tin oxide thin films grown by Streaming process for Electrodeless Electrochemical Deposition

    NASA Astrophysics Data System (ADS)

    Yusuf, Gbadebo; Khalilzadeh-Rezaie, Farnood; Cleary, Justin W.; Oladeji, Isaiah O.; Suu, Koukou; Schoenfeld, Winston V.; Peale, Robert E.; Awodugba, Ayodeji O.

    2015-04-01

    This work investigated the characteristics of SnO2: F films grown by Streaming Process for Electrodeless Electrochemical Deposition (SPEED). Stannic chloride (SnCl4) and ammonium fluoride (NH4 F) was dissolved in a mixture of deionized water and organic solvents. The preheated substrate temperature was varied between 450 and 530° C. High quality SnO2: F films were grown at all the substrate temperatures studied. The typical film thickness was 250 nm. XRD shows that the grown films are polycrystalline SnO2 with a tetragonal crystal structure. The average optical transmission of the films was around 93% throughout the wavelength of 400 to 1000 nm. The lowest electrical resistivity achieved was 6 x 10-4 Ω cm. The Hall measurements showed that the film is an n-type semiconductor, with the highest carrier mobility of 8.3 cm2/V.s, and concentration of 1 x 1021 cm-3. The direct band gap was determined to be 4 eV from the transmittance spectrum.

  18. Structural and optical properties of La-doped BaSnO3 thin films grown by PLD

    NASA Astrophysics Data System (ADS)

    James, K. K.; Krishnaprasad, P. S.; Hasna, K.; Jayaraj, M. K.

    2015-01-01

    In this study the structural and optical properties of lanthanum-doped BaSnO3 powder samples and thin films deposited on fused silica were investigaed using laser ablation. Under an oxygen pressure of 5×10-4 mbar, phase pure BaSnO3 films with a lattice constant of 0.417 nm and grain size of 21 nm were prepared at 630 °C. The band gap of BaSnO3 powder sample and thin films was calculated to be 3.36 eV and 3.67 eV, respectively. There was a progressive increase in conductivity for thin films of BaSnO3 doped with 0~7 at% of La. The highest conductivity, 9 Scm-1, was obtained for 7 at% La-doped BaSnO3. Carrier concentration, obtained from Burstein-Moss (B-M) shift, nearly matches the measured values except for 3 at% and 10 at% La-doped BaSnO3 thin films.

  19. Microstructure and magnetic properties of FeCo epitaxial thin films grown on MgO single-crystal substrates

    SciTech Connect

    Shikada, Kouhei; Ohtake, Mitsuru; Futamoto, Masaaki; Kirino, Fumiyoshi

    2009-04-01

    FeCo epitaxial films were prepared on MgO(100), MgO(110), and MgO(111) substrates by ultrahigh vacuum molecular beam epitaxy. FeCo thin films with (100), (211), and (110) planes parallel to the substrate surface grow on respective MgO substrates. FeCo/MgO interface structures are studied by high-resolution cross-sectional transmission electron microscopy and the epitaxial growth mechanism is discussed. Atomically sharp boundaries are recognized between the FeCo thin films and the MgO substrates where misfit dislocations are introduced in the FeCo thin films presumably to decrease the lattice misfits. Misfit dislocations are observed approximately every 9 and 1.4 nm in FeCo thin film at the FeCo/MgO(100) and the FeCo/MgO(110) interfaces, respectively. X-ray diffraction analysis indicates that the lattice spacing measured parallel to the single-crystal substrate surfaces are in agreement within 0.1% with those of the respective bulk values of Fe{sub 50}Co{sub 50} alloy crystal, showing that the FeCo film strain is very small. The magnetic anisotropies of these epitaxial films basically reflect the magnetocrystalline anisotropy of bulk FeCo alloy crystal.

  20. Oxygen partial pressure influence on the character of InGaZnO thin films grown by PLD

    NASA Astrophysics Data System (ADS)

    Lu, Yi; Wang, Li

    2012-11-01

    The amorphous oxide semiconductors (AOSs) are promising for emerging large-area optoelectronic applications because of capability of large-area, uniform deposition at low temperatures such as room temperature (RT). Indium-gallium-zinc oxide (InGaZnO) thin film is a promising amorphous semiconductors material in thin film transistors (TFT) for its excellent electrical properties. In our work, the InGaZnO thin films are fabricated on the SiO2 glass using pulsed laser deposition (PLD) in the oxygen partial pressure altered from 1 to 10 Pa at RT. The targets were prepared by mixing Ga2O3, In2O3, and ZnO powder at a mol ratio of 1: 7: 2 before the solid-state reactions in a tube furnace at the atmospheric pressure. The targets were irradiated by an Nd:YAG laser(355nm). Finally, we have three films of 270nm, 230nm, 190nm thick for 1Pa, 5Pa, 10Pa oxygen partial pressure. The product thin films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), Hall-effect investigation. The comparative study demonstrated the character changes of the structure and electronic transport properties, which is probably occurred as a fact of the different oxygen partial pressure used in the PLD.

  1. Effects of pH on the characteristics of ZnS thin films grown by using the CBD method

    NASA Astrophysics Data System (ADS)

    Ahn, Heejin; Lee, Dongchan; Park, Sujung; Um, Youngho

    In CIGS-based thin film solar cells, a chemically deposited ZnS buffer layer with high resistivity is generally used between the absorber layer and transparent conducting oxide layer. In this work, we report a chemical process to prepare ZnS films by the CBD technique based on the typical bath deposition. The influences of ammonia (NH4OH) and Na2EDTA (Na2C10H16N2O8) as complexing agents on structural, morphological, and optical properties of ZnS thin films are investigated ranging pH concentration from 5 to 10. To investigate effects of pH on the characteristics of ZnS thin films, by using UV-visible transmittance, atomic force microscopy, and optical absorption were investigated. With changing the pH range, the ZnS thin films demonstrate high transmittance of 75~80% in the visible region, indicating the films are potentially useful in photovoltaic applications. The results will be presented in detail. This research was supported by Basic Science Research Program through the National Research Foundation of Korea(NRF) funded by the Ministry of Education (2011-0024709).

  2. Structural and optical properties of ZnMgO thin films grown by pulsed laser deposition using ZnO-MgO multiple targets

    NASA Astrophysics Data System (ADS)

    Maemoto, Toshihiko; Ichiba, Nobuyasu; Ishii, Hiroaki; Sasa, Shigehiko; Inoue, Masataka

    2007-04-01

    We report on structural and optical properties for Zn1-xMgxO (ZMO) thin films produced by pulsed laser ablation. ZMO thin films were grown on a-plane Al2O3 substrates at 400°C. In order to efficiently incorporate Mg into ZnO thin films, we used multiple ZnO-MgO ablation targets. Pulses from a Nd:YAG laser (4th harmonic generation: 266 nm) were directed on the ZnO-MgO ablation targets, which consisted of MgO single crystals mounted on ZnO ceramic targets. The ZMO films were characterized by x-ray diffraction, optical transmittance and cathodeluminescence (CL) measurements. Highly c-axis oriented ZMO(0002) reflections corresponding to the wurtzite-phase were observed. The c-axis lattice constants of the films were determined from the ZnMgO(0002) peak. The c-axis length of the ZMO films decreased linearly with Mg content. From the optical transmittance spectra of ZMO films, we observed a blue shift in the absorption edge with increasing Mg content. Band gap energies of ZMO thin films were determined from the optical transmittance and CL spectra. We found that the band gap energy changed from 3.27 eV to 3.95 eV. The Mg content of ZMO films increased monotonically with the number of laser pulses which struck the MgO target. These results show that laser ablation using multiple targets of ZnO and MgO is effective for band engineering of ZMO.

  3. Tuning the metal-insulator transition via epitaxial strain and Co doping in NdNiO3 thin films grown by polymer-assisted deposition

    NASA Astrophysics Data System (ADS)

    Yao, Dan; Shi, Lei; Zhou, Shiming; Liu, Haifeng; Zhao, Jiyin; Li, Yang; Wang, Yang

    2016-01-01

    The epitaxial NdNi1-xCoxO3 (0 ≤ x ≤ 0.10) thin films on (001) LaAlO3 and (001) SrTiO3 substrates were grown by a simple polymer-assisted deposition technique. The co-function of the epitaxial strain and Co doping on the metal-insulator transition in perovskite nickelate NdNiO3 thin films is investigated. X-ray diffraction and scanning electron microscopy reveal that the as-prepared thin films exhibit good crystallinity and heteroepitaxy. The temperature dependent resistivities of the thin films indicate that both the epitaxial strain and Co doping lower the metal-insulator (MI) transition temperature, which can be treated as a way to tune the MI transition. Furthermore, under the investigated Co-doping levels, the MI transition temperature (TMI) shifts to low temperatures with Co content increasing under both compressive and tensile strain, and the more distinction is in the former situation. When x is increased up to 0.10, the insulating phase is completely suppressed under the compressive strain. With the strain increases from compression to tension, the resistivities are enhanced both in the metal and insulating regions. However, the Co-doping effect on the resistivity shows a more complex situation. As Co content x increases from zero to 0.10, the resistivities are reduced both in the metal and insulating regions under the tensile strain, whereas they are enhanced in the high-temperature metal region under the compressive strain. Based on the temperature dependent resistivity in the metal regions, it is suggested that the electron-phonon coupling in the films becomes weaker with the increase of both the strain and Co-doping.

  4. Influence of Gas Adsorption and Gold Nanoparticles on the Electrical Properties of CVD-Grown MoS2 Thin Films.

    PubMed

    Cho, Yunae; Sohn, Ahrum; Kim, Sujung; Hahm, Myung Gwan; Kim, Dong-Ho; Cho, Byungjin; Kim, Dong-Wook

    2016-08-24

    Molybdenum disulfide (MoS2) has increasingly attracted attention from researchers and is now one of the most intensively explored atomic-layered two-dimensional semiconductors. Control of the carrier concentration and doping type of MoS2 is crucial for its application in electronic and optoelectronic devices. Because the MoS2 layers are atomically thin, their transport characteristics may be very sensitive to ambient gas adsorption and the resulting charge transfer. We investigated the influence of the ambient gas (N2, H2/N2, and O2) choice on the resistance (R) and surface work function (WF) of trilayer MoS2 thin films grown via chemical vapor deposition. We also studied the electrical properties of gold (Au)-nanoparticle (NP)-coated MoS2 thin films; their R value was found to be 2 orders of magnitude smaller than that for bare samples. While the WF largely varied for each gas, R was almost invariant for both the bare and Au-NP-coated samples regardless of which gas was used. Temperature-dependent transport suggests that variable range hopping is the dominant mechanism for electrical conduction for bare and Au-NP-coated MoS2 thin films. The charges transferred from the gas adsorbates might be insufficient to induce measurable R change and/or be trapped in the defect states. The smaller WF and larger localization length of the Au-NP-coated sample, compared with the bare sample, suggest that more carriers and less defects enhanced conduction in MoS2. PMID:27490096

  5. Comparative Study of Thermal Stability of NiFe and NiFeTa Thin Films Grown by Cosputtering Technique

    NASA Astrophysics Data System (ADS)

    Phuoc, Nguyen N.; Ong, C. K.

    2016-08-01

    A comparative study of the thermal behavior of dynamic permeability spectra for compositionally graded NiFeTa and uniform-composition NiFe thin films has been carried out. We found that the resonance frequency of the compositionally graded NiFeTa film increased with increasing temperature, while it decreased for the case of the uniform-composition NiFe thin film. This finding unambiguously suggests that the compositional gradient of the film is the only reason for the increase of the magnetic anisotropy with temperature due to its stress-induced origin, while the cosputtering technique does not play any role in this peculiar behavior. The temperature dependence of the frequency linewidth is also presented and discussed.

  6. Electron spin resonance of Zn{sub 1-x}Mg{sub x}O thin films grown by plasma-assisted molecular beam epitaxy

    SciTech Connect

    Wassner, T. A.; Stutzmann, M.; Brandt, M. S.; Laumer, B.; Althammer, M.; Goennenwein, S. T. B.; Eickhoff, M.

    2010-08-30

    Zn{sub 1-x}Mg{sub x}O thin films with a Mg content x between 0 and 0.42 grown by plasma-assisted molecular beam epitaxy on c-plane sapphire substrates were investigated by electron spin resonance at 5 K. Above band gap illumination induces a persistent resonance signal, which is attributed to free conduction band electrons. The g-factors of the Zn{sub 1-x}Mg{sub x}O epitaxial layers and their anisotropy were determined experimentally and an increase from g{sub ||}=1.957 for x=0 to g{sub ||}=1.970 for x=0.42 was found, accompanied by a decrease in anisotropy. A comparison with g-factors of the Al{sub x}Ga{sub 1-x}N system is also given.

  7. The interface analysis of GaN grown on 0° off 6H-SiC with an ultra-thin buffer layer

    NASA Astrophysics Data System (ADS)

    Sun, Zheng; Ohta, Akio; Miyazaki, Seiichi; Nagamatsu, Kentaro; Lee, Hojun; Olsson, Marc; Ye, Zheng; Deki, Manato; Honda, Yoshio; Amano, Hiroshi

    2016-01-01

    Previously, we reported a growth method by metalorganic vapor phase epitaxy using a single two-dimensional growth step, resulting in 1.2-µm crack-free GaN directly grown on 6H-SiC substrate. The introduction of Al-treatment prior to the standard GaN growth step resulted in improved surface wetting of gallium on the SiC substrate. Transmission electron microscope and energy dispersive spectrometer analysis of the epitaxial interface to the SiC determined that an ultra-thin AlGaN interlayer had formed measuring around 2-3 nm. We expect our growth technique can be applied to the fabrication of GaN/SiC high frequency and high power devices.

  8. Spin wave and percolation studies in epitaxial La2/3Sr1/3MnO3 thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Ettayfi, A.; Moubah, R.; Hlil, E. K.; Colis, S.; Lenertz, M.; Dinia, A.; Lassri, H.

    2016-07-01

    We investigate the magnetic and transport properties of high quality La2/3Sr1/3MnO3 thin films grown by pulsed laser deposition. X-ray diffraction shows that the deposited films are epitaxial with the expected pseudo-cubic structure. Using the spin wave theory, the temperature dependence of magnetization was satisfactory modeled at low temperature, in which several fundamental magnetic parameters were obtained (spin wave stiffness, exchange constants, Fermi wave-vector, Mn-Mn interatomic distance). The transport properties were studied via the temperature dependence of electrical resistivity [ρ(T)], which shows a peak at Curie temperature due to metal to insulator transition. The percolation theory was used to simulate ρ(T) in both the ferromagnetic and paramagnetic phases. Reasonable agreement with the experimental data is reported.

  9. Synthesis of nanocrystalline Cu{sub 2}ZnSnS{sub 4} thin films grown by the spray-pyrolysis technique

    SciTech Connect

    Chandel, Tarun Singh, Joginder; Rajaram, P.

    2015-08-28

    Spray pyrolysis was used to deposit Cu{sub 2}ZnSnS{sub 4} (CZTS) thin films on soda lime glass substrates at 300 °C. Aqueous solutions of copper chloride, zinc chloride, stannous chloride and thiourea were mixed together to form the spray liquid. The sprayed films were annealed under vacuum at 350 °C, 400 °C and 450 °C. Structural and optical characterization was performed on the CZTS films using X-ray diffraction (XRD) and UV-VIS spectrophotometry. XRD results indicate that the films are single phase nanocrystalline CZTS. Optical studies show that the optical gap values are 1.44 eV for the as-grown film and 1.46 eV, 1.48 eV and 1.49 eV for the films annealed at 350 °C, 400 °C and 450 °C, respectively.

  10. Characterization of M-plane GaN thin films grown on misoriented γ-LiAlO2 (100) substrates

    NASA Astrophysics Data System (ADS)

    Lin, Yu-Chiao; Lo, Ikai; Wang, Ying-Chieh; Yang, Chen-Chi; Hu, Chia-Hsuan; Chou, Mitch M. C.; Schaadt, D. M.

    2016-09-01

    M-plane GaN thin films were grown on 11° misoriented γ-LiAlO2 substrates without peeling off or cracking by plasma-assisted molecular beam epitaxy. Because of anisotropic growth kinetics, which leads to an anisotropic compressive in-plane strain in the M-plane GaN films, the surface presents a rough morphology with worse crystal quality. The crystal quality of sample was optimally improved, XRD rocking curve FWHM of which is about 900 arcsec, by raising growth temperature to 800 °C with proper Ga/N flux ratio. As the crystal quality was improved, the polarization ratio decreased from the unity (less than 0.8) which could be attributed to the effect of exciton localization due to the partial increased in-plane strain.

  11. Magnetic properties of Mn{sub x}Ti{sub 1-x}N thin films grown by plasma-assisted molecular beam epitaxy

    SciTech Connect

    Wu, S. X.; Xia, Y. Q.; Yu, X. L.; Liu, Y. J.; Li, S. W.

    2007-09-15

    High-quality Mn{sub x}Ti{sub 1-x}N thin films were grown on MgO(001) substrates using plasma-assisted molecular beam epitaxy. Magnetic measurements evidence the presence of ferromagnetism with Curie temperature exceeding 380 K. X-ray photoelectron spectroscopy indicates that the Mn ions are in a divalent state and uniformly substitute on Ti cation sites, consistent with the ferromagnetism that correlates with Mn substitution on Ti sites. The origin of the ferromagnetism might be attributed to itinerant-carrier mediated Rudermann-Kittel-Kasuya-Yosida (RKKY)-type long-range coupling which allows for arbitrary itinerant-carrier spin polarization and dynamic correlations.

  12. LiNbO3 thin-film optical waveguide grown by liquid phase epitaxy using Li2O-B2O3 flux

    NASA Astrophysics Data System (ADS)

    Yamada, Atsuo; Tamada, Hitoshi; Saitoh, Masaki

    1992-12-01

    Nearly stoichiometric LiNbO3 thin-film waveguides with high crystallinity and good surface morphology were grown on a 5 mol % MgO-doped Z-plate LiNbO3 substrate by liquid phase epitaxy using Li2O-B2O3 flux. The profile of the film-substrate interface was estimated to be nearly a step and a domain inversion with a distinct boundary at the -Z surface of the substrate was observed. Waveguiding was realized for an ordinary wave, but not for an extraordinary wave. There existed no significant optical absorption to the fundamental absorption edge, resulting in a negligibly small propagation loss of less than 1 dB/cm at a wavelength of 458 nm.

  13. Thin film transistors using preferentially grown semiconducting single-walled carbon nanotube networks by water-assisted plasma-enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Kim, Un Jeong; Lee, Eun Hong; Kim, Jong Min; Min, Yo-Sep; Kim, Eunseong; Park, Wanjun

    2009-07-01

    Nearly perfect semiconducting single-walled carbon nanotube random network thin film transistors were fabricated and their reproducible transport properties were investigated. The networked single-walled carbon nanotubes were directly grown by water-assisted plasma-enhanced chemical vapor deposition. Optical analysis confirmed that the nanotubes were mostly semiconductors without clear metallic resonances in both the Raman and the UV-vis-IR spectroscopy. The transistors made by the nanotube networks whose density was much larger than the percolation threshold also showed no metallic paths. Estimation based on the conductance change of semiconducting nanotubes in the SWNT network due to applied gate voltage difference (conductance difference for on and off state) indicated a preferential growth of semiconducting nanotubes with an advantage of water-assisted PECVD. The nanotube transistors showed 10-5 of on/off ratio and ~8 cm2 V-1 s-1 of field effect mobility.

  14. Thin film transistors using preferentially grown semiconducting single-walled carbon nanotube networks by water-assisted plasma-enhanced chemical vapor deposition.

    PubMed

    Kim, Un Jeong; Lee, Eun Hong; Kim, Jong Min; Min, Yo-Sep; Kim, Eunseong; Park, Wanjun

    2009-07-22

    Nearly perfect semiconducting single-walled carbon nanotube random network thin film transistors were fabricated and their reproducible transport properties were investigated. The networked single-walled carbon nanotubes were directly grown by water-assisted plasma-enhanced chemical vapor deposition. Optical analysis confirmed that the nanotubes were mostly semiconductors without clear metallic resonances in both the Raman and the UV-vis-IR spectroscopy. The transistors made by the nanotube networks whose density was much larger than the percolation threshold also showed no metallic paths. Estimation based on the conductance change of semiconducting nanotubes in the SWNT network due to applied gate voltage difference (conductance difference for on and off state) indicated a preferential growth of semiconducting nanotubes with an advantage of water-assisted PECVD. The nanotube transistors showed 10(-5) of on/off ratio and approximately 8 cm2 V(-1) s(-1) of field effect mobility. PMID:19567966

  15. Effect of post-growth rapid thermal annealing on bilayer InAs/GaAs quantum dot heterostructure grown with very thin spacer thickness

    SciTech Connect

    Sengupta, S.; Halder, N.; Chakrabarti, S.

    2010-11-15

    We have investigated the effect of post-growth rapid thermal annealing on self-assembled InAs/GaAs bilayer quantum dot samples having very thin barrier thickness (7.5-8.5 nm). In/Ga interdiffusion in the samples due to annealing is presumed to be controlled by the vertical strain coupling from the seed dots in bilayer heterostructure. Strain coupling from embedded seed QD layer maintains a strain relaxed state in active top islands of the bilayer quantum dot sample grown with comparatively thick spacer layer (8.5 nm). This results in minimum In/Ga interdiffusion. However controlled interdiffusion across the interface between dots and GaAs barrier, noticeably enhances the emission efficiency in such bilayer quantum dot heterostructure on annealing up to 700 {sup o}C.

  16. Domain formation due to surface steps in topological insulator Bi{sub 2}Te{sub 3} thin films grown on Si (111) by molecular beam epitaxy

    SciTech Connect

    Borisova, S.; Kampmeier, J.; Mussler, G.; Grützmacher, D.; Luysberg, M.

    2013-08-19

    The atomic structure of topological insulators Bi{sub 2}Te{sub 3} thin films on Si (111) substrates grown in van der Waals mode by molecular beam epitaxy has been investigated by in situ scanning tunneling microscopy and scanning transmission electron microscopy. Besides single and multiple quintuple layer (QL) steps, which are typical for the step-flow mode of growth, a number of 0.4 QL steps is observed. We determine that these steps originate from single steps at the substrate surface causing domain boundaries in the Bi{sub 2}Te{sub 3} film. Due to the peculiar structure of these domain boundaries the domains are stable and penetrate throughout the entire film.

  17. Realization of compressively strained GaN films grown on Si(110) substrates by inserting a thin AlN/GaN superlattice interlayer

    SciTech Connect

    Shen, X. Q.; Takahashi, T.; Kawashima, H.; Ide, T.; Shimizu, M.

    2012-07-16

    We investigate the strain properties of GaN films grown by plasma-assisted molecular beam epitaxy on Si(110) substrates. It is found that the strain of the GaN film can be converted from a tensile to a compressive state simply by inserting a thin AlN/GaN superlattice structure (SLs) within the GaN film. The GaN layers seperated by the SLs can have different strain states, which indicates that the SLs plays a key role in the strain modulation during the growth and the cooling down processes. Using this simple technique, we grow a crack-free GaN film exceeding 2-{mu}m-thick. The realization of the compressively strained GaN film makes it possible to grow thick GaN films without crack generation on Si substrates for optic and electronic device applications.

  18. Thickness-dependent cation order and disorder in PbSc0.5Ta0.5O3 thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Chopra, Anuj; Birajdar, Balaji I.; Berger, Andreas; Alexe, Marin; Hesse, Dietrich

    2014-01-01

    We report on thickness-dependent cation ordering and ferroelectric properties of (001)-oriented epitaxial PbSc0.5Ta0.5O3 (PST) thin films grown by pulsed laser deposition on SrTiO3 (001) and Si (001) substrates. The PST film thickness was varied from 30 to 200 nm. Only films thicker than 40 nm reveal (partial) cation ordering, which increases with thickness as confirmed by the appearance and intensity of superstructure reflections in x-ray diffraction and transmission electron microscopy. In accordance with the two-state thermodynamic model, temperature-dependent dielectric constant investigations showed the presence of two kinds of phase transitions belonging to the normal ferroelectric and the relaxor state, respectively, both being present in the PST films. The influence of cation ordering on the phase transition and ferroelectric properties is discussed in detail.

  19. Nonlinear optical dynamics and Eu{sup 3+} spectral holeburning in strontium barium niobate thin film grown by pulsed laser deposition.

    SciTech Connect

    Liu, H.; Liu, G. K.; Li, S. T.; Fernandez, F. E.; Chemistry; Univ. of Puerto Rico

    2002-01-01

    Optical quality Sr{sub x}Ba{sub 1-x}Nb{sub 2}O{sub 6} (SBN) thin films, both undoped and Eu{sup 3 +} -doped, of thickness less than 0.5 {mu}m have been successfully grown on fused quartz substrates using a pulsed laser deposition technique. Optical properties of these films were characterized in high-resolution spectroscopic experiments in time and frequency domains. For undoped SBN thin films, broadband emission in the UV region extending to the visible was observed following excitation at 355 nm. This emission is attributed to exciton luminescence of the SBN film. Nonlinear optical response in the picosecond regime and the third-order nonlinear susceptibility, chi(3), were studied using degenerate four-wave-mixing methods. In transverse alignment, chi(3) is enhanced by two orders of magnitude in comparison with its bulk counterpart. A thermal annealing process, monitored via changes in spectral properties of Eu3 + , was employed to convert the as-grown amorphous film into a polycrystalline film. High-resolution spectroscopic measurements in the frequency domain were conducted on a 200-nm-thick film of Eu{sup 3 +}-doped SBN. Our spectroscopic results suggest that Eu{sup 3 +} ions may substitute for Nb, thereby occupying a normally six-fold coordinated lattice site. At liquid helium temperature, spectral holes in the {sup 7}F{sub 0}-{sup 5}D{sub 0} optical transition were burned in the thermally annealed films. Typical observed hole widths were 70-100 MHz and hole depths were as large as 30% of the peak fluorescence intensity.

  20. Influence of La and Mn vacancies on the electronic and magnetic properties of LaMnO3 thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Marozau, Ivan; Das, Proloy T.; Döbeli, Max; Storey, James G.; Uribe-Laverde, Miguel A.; Das, Saikat; Wang, Chennan; Rössle, Matthias; Bernhard, Christian

    2014-05-01

    With pulsed laser deposition, we have grown c axis oriented thin films of the nominal composition LaMnO3 (LMO) on LSAT(001) substrates. We find that, depending on the oxygen background pressure during growth, the LMO films contain sizeable amounts of La and/or Mn vacancies that strongly influence their electronic and magnetic properties. Specifically, we show that the Mn/La ratio can be systematically varied from 0.92 at 0.11 mbar to 1.09 at 0.30 mbar of oxygen. The cationic vacancies have markedly different effects that become most pronounced once the samples are fully oxygenated and thus strongly hole doped. All as-grown and thus slightly oxygen-deficient LMO films are ferromagnetic insulators with saturation moments in excess of 2.5 μB per Mn ion, their transport and optical properties can be understood in terms of trapped ferromagnetic polarons. Upon oxygen annealing, the most La-deficient films develop a metallic response with an even larger ferromagnetic saturation moment of 3.8 μB per Mn ion. In contrast, in the oxygenated Mn-deficient films, the ferromagnetic order is strongly suppressed to less than 0.5 μB per Mn ion, and the transport remains insulatorlike. We compare our results with the ones that were previously obtained on bulk samples and present an interpretation in terms of the much stronger disruption of the electronic and magnetic structure by the Mn vacancies as compared to the La vacancies. We also discuss the implications for the growth of LMO thin films with well-defined physical properties that are a prerequisite for the study of interface effects in multilayers.

  1. Photoreflectance analysis of annealed vanadium-doped GaAs thin films grown by metalorganic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Fitouri, H.; Bilel, C.; Zaied, I.; Bchetnia, A.; Rebey, A.; El Jani, B.

    2015-09-01

    In this study, we investigate the optical properties of annealed vanadium-doped GaAs films grown on GaAs substrates by metalorganic vapor phase epitaxy. The temperature dependence of the photoreflectance (PR) of as-grown GaAs:V films has been studied. We used the fit with Third-Derivative Functional Form model to evaluate the physical parameters. The temperature dependence of band gap and spin-orbit energies can be described by the Bose-Einstein statistical expression. The PR spectra of the samples are measured after thermal annealing in order to check any improvement in the optical quality of the material. The PR signal amplitude of GaAs:V samples decreased after thermal annealing. Degradation of the PR signal for annealing temperature at about 850 °C is observed revealing a poor quality of the layer surface states and an important density of the recombination centers. The lock-in phase analysis of PR spectra allows to determine the time constant for GaAs:V sample before and after thermal annealing.

  2. Buffer-enhanced room-temperature growth and characterization of epitaxial ZnO thin films

    SciTech Connect

    Sasaki, Atsushi; Hara, Wakana; Matsuda, Akifumi; Tateda, Norihiro; Otaka, Sei; Akiba, Shusaku; Saito, Keisuke; Yodo, Tokuo; Yoshimoto, Mamoru

    2005-06-06

    The room-temperature epitaxial growth of ZnO thin films on NiO buffered sapphire (0001) substrate was achieved by using the laser molecular-beam-epitaxy method. The obtained ZnO films had the ultrasmooth surface reflecting the nanostepped structure of the sapphire substrate. The crystal structure at the surface was investigated in situ by means of coaxial impact-collision ion scattering spectroscopy. It was proved that the buffer-enhanced epitaxial ZnO thin films grown at room temperature had +c polarity, while the polarity of high-temperature grown ZnO thin films on the sapphire was -c. Photoluminescence spectra at room temperature were measured for the epitaxial ZnO films, showing only the strong ultraviolet emission near 380 nm.

  3. High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition

    NASA Astrophysics Data System (ADS)

    Kim, Seong Keun; Kim, Wan-Don; Kim, Kyung-Min; Hwang, Cheol Seong; Jeong, Jaehack

    2004-11-01

    TiO2 thin films with high dielectric constants (83-100) were grown on a Ru electrode at a growth temperature of 250 °C using the atomic-layer deposition method. The as-deposited films were crystallized with rutile structure. Adoption of O3 with a very high concentration (400g/m3) was crucial for obtaining the rutile phase and the high dielectric constant. The leakage current density of a TiO2 film with an equivalent oxide thickness of 1.0-1.5 nm was 10-6-10-8A/cm2 at ±1V. All these electrical properties were obtained after limited postannealing where the annealing temperature was <500°C, which is crucial to the structural stability of the Ru electrode. Therefore, these TiO2 films are very promising as the capacitor dielectrics of dynamic random access memories. TiO2 films grown on a bare Si wafer or Pt electrode by the same process had anatase structure and a dielectric constant of ˜40.

  4. Structural properties of Bi2Te3 topological insulator thin films grown by molecular beam epitaxy on (111) BaF2 substrates

    NASA Astrophysics Data System (ADS)

    Fornari, Celso I.; Rappl, Paulo H. O.; Morelhão, Sérgio L.; Abramof, Eduardo

    2016-04-01

    Structural properties of topological insulator bismuth telluride films grown epitaxially on (111) BaF2 with a fixed Bi2Te3 beam flux were systematically investigated as a function of substrate temperature and additional Te flux. A layer-by-layer growth mode is observed since the early stages of epitaxy and remains throughout the whole deposition. Composition of the epitaxial films produced here stays between Bi2Te3 and Bi4Te5, as determined from the comparison of the measured x-ray diffraction curves with calculations. The substrate temperature region, where the growth rate remains constant, is found to be the most appropriate to obtain ordered Bi2Te3 films. Line width of the L = 18 Bi2Te3 diffraction peaks as low as 140 arcsec was obtained, indicating high crystalline quality. Twinning domains density rises with increasing growth temperature and reducing Te extra flux. X-ray reflectivity curves of pure Bi2Te3 films with thickness from 165 to 8 nm exhibited well defined interference fringes, evidencing homogeneous layers with smooth surface. Our results demonstrate that Bi2Te3 films with very well controlled structural parameters can be obtained. High structural quality Bi2Te3 films as thin as only eight quintuple layers grown here are promising candidates for intrinsic topological insulator.

  5. Two coexisting mechanisms of dislocation reduction in an AlGaN layer grown using a thin GaN interlayer

    SciTech Connect

    Bai, J.; Wang, T.; Parbrook, P. J.; Wang, Q.; Lee, K. B.; Cullis, A. G.

    2007-09-24

    A significant dislocation reduction is achieved in an AlGaN layer grown on an AlN buffer by introducing a thin GaN interlayer. The mechanisms for the dislocation reduction are explored by transmission electron microscopy, energy-dispersive x-ray spectroscopy, atomic force microscopy, and micro-Raman spectroscopy. The GaN interlayer grown on the AlN takes the form of platelets. The mechanisms of dislocation reduction in the platelet area and the area between the platelets are different. In the GaN platelets, due to the large misfit strain, the threading dislocations (TDs) in the AlN layer migrate into the interface and annihilate with each other. However, the GaN between the platelets is highly strained so that a higher density of TDs from AlN is incorporated into the upper layer. The coalescing of the platelets induced by the AlGaN growth makes the TDs in the areas between the platelets assemble and annihilate, resulting in additional dislocation reduction.

  6. Growth, microstructure and electrical properties of sputter-deposited hafnium oxide (HfO2) thin films grown using HfO2 ceramic target

    SciTech Connect

    Aguirre, B.; Vemuri, R. S.; Zubia, David; Engelhard, Mark H.; Shutthanandan, V.; Kamala Bharathi, K.; Ramana, Chintalapalle V.

    2011-01-01

    Hafnium oxide (HfO₂) thin films have been made by radio-frequency (rf) magnetron-sputtering onto Si(100) substrates under varying growth temperature (Ts). HfO₂ ceramic target has been employed for sputtering while varying the Ts from room temperature to 500⁰C during deposition. The effect of Ts on the growth and microstructure of deposited HfO₂ films has been studied using grazing incidence x-ray diffraction (GIXRD), X-ray photoelectron spectroscopy (XPS), and high-resolution scanning electron microscopy (HR-SEM) coupled with energy dispersive x-ray spectrometry (EDS). The results indicate that the effect of Ts is significant on the growth, surface and interface structure, morphology and chemical composition of the HfO₂ films. Structural characterization indicates that the HfO₂ films grown at Ts<200 ⁰C are amorphous while films grown at Ts>200 ⁰C are nanocrystalline. An amorphous-to-crystalline transition occurs at Ts=200 ⁰C. Nanocrystalline HfO₂ films crystallized in a monoclinic structure with a (-111) orientation. XPS measurements indicated the high surface-chemical quality and stoichiometric nature of the grown HfO₂ films. An interface layer (IL) formation occurs due to reaction at the HfO₂-Si interface for HfO₂ films deposited at Ts>200 ⁰C. The thickness of IL increases with increasing Ts. XPS and EDS at the HfO₂-Si cross-section indicate the IL is a (Hf, Si)-O compound. The electrical characterization using capacitance-voltage measurements indicate that the dielectric constant decreases from 25 to 16 with increasing Ts.

  7. Atomic layer deposition grown MO{sub x} thin films for solar water splitting: Prospects and challenges

    SciTech Connect

    Singh, Trilok; Lehnen, Thomas; Leuning, Tessa; Mathur, Sanjay

    2015-01-15

    The magnitude of energy challenge not only calls for efficient devices but also for abundant, inexpensive, and stable photoactive materials that can enable efficient light harvesting, charge separation and collection, as well as chemical transformations. Photoelectrochemical systems based on semiconductor materials have the possibility to transform solar energy directly into chemical energy the so-called “solar hydrogen.” The current challenge lies in the harvesting of a larger fraction of electromagnetic spectrum by enhancing the absorbance of electrode materials. In this context, atomically precise thin films of metal oxide semiconductors and their multilayered junctions are promising candidates to integrate high surface areas with well-defined electrode–substrate interface. Given its self-limited growth mechanism, the atomic layer deposition (ALD) technique offers a wide range of capabilities to deposit and modify materials at the nanoscale. In addition, it opens new frontiers for developing precursor chemistry that is inevitable to design new processes. Herein, the authors review the properties and potential of metal oxide thin films deposited by ALD for their application in photoelectrochemical water splitting application. The first part of the review covers the basics of ALD processes followed by a brief discussion on the electrochemistry of water splitting reaction. The second part focuses on different MO{sub x} films deposited by atomic layer deposition for water splitting applications; in this section, The authors discuss the most explored MO{sub x} semiconductors, namely, Fe{sub 2}O{sub 3}, TiO{sub 2}, WO{sub 3}, and ZnO, as active materials and refer to their application as protective coatings, conductive scaffolds, or in heterojunctions. The third part deals with the current challenges and future prospects of ALD processed MO{sub x} thin films for water splitting reactions.

  8. Structural characterization of metastable hcp-Ni thin films epitaxially grown on Au(100) single-crystal underlayers

    SciTech Connect

    Ohtake, Mitsuru; Tanaka, Takahiro; Futamoto, Masaaki; Kirino, Fumiyoshi

    2010-05-15

    Ni(1120) epitaxial thin films with hcp structure were prepared on Au(100) single-crystal underlayers at 100 deg. C by ultra high vacuum molecular beam epitaxy. The detailed film structure is studied by in situ reflection high energy electron diffraction, x-ray diffraction, and transmission electron microscopy. The hcp-Ni film consists of two types of variants whose c-axes are rotated around the film normal by 90 deg. each other. An atomically sharp boundary is recognized between the film and the underlayer, where misfit dislocations are introduced. Presence of such dislocations seems to relieve the strain caused by the lattice mismatch between the film and the underlayer.

  9. Resistive switching characteristics of ZnO thin film grown on stainless steel for flexible nonvolatile memory devices

    SciTech Connect

    Lee, Seunghyup; Kim, Heejin; Yong, Kijung; Yun, Dong-Jin; Rhee, Shi-Woo

    2009-12-28

    This paper reports a resistive switching device of Au/ZnO/stainless steel (SS) and its applicability as a flexible resistive random access memory (ReRAM). The Au/ZnO/SS structure was fabricated by radio frequency sputtering deposition of a ZnO thin film on the SS substrate. The fabricated device showed stable unipolar and bipolar resistive switching behaviors with reliable switching responses over 100 cycles. The device performance was not degraded upon bending, which indicates high potential for flexible ReRAM applications.

  10. Molecular beam epitaxy-grown wurtzite MgS thin films for solar-blind ultra-violet detection

    SciTech Connect

    Lai, Y. H.; He, Q. L.; Cheung, W. Y.; Lok, S. K.; Wong, K. S.; Sou, I. K.; Ho, S. K.; Tam, K. W.

    2013-04-29

    Molecular beam epitaxy grown MgS on GaAs(111)B substrate was resulted in wurtzite phase, as demonstrated by detailed structural characterizations. Phenomenological arguments were used to account for why wurtzite phase is preferred over zincblende phase or its most stable rocksalt phase. Results of photoresponse and reflectance measurements performed on wurtzite MgS photodiodes suggest a direct bandgap at around 5.1 eV. Their response peaks at 245 nm with quantum efficiency of 9.9% and enjoys rejection of more than three orders at 320 nm and close to five orders at longer wavelengths, proving the photodiodes highly competitive in solar-blind ultraviolet detection.

  11. Reversible Change in Electrical and Optical Properties in Epitaxially Grown Al-Doped ZnO Thin Films

    SciTech Connect

    Noh, J. H.; Jung, H. S.; Lee, J. K.; Kim, J. Y; Cho, C. M.; An, J.; Hong, K. S.

    2008-01-01

    Aluminum-doped ZnO (AZO) films were epitaxially grown on sapphire (0001) substrates using pulsed laser deposition. As-deposited AZO films had a low resistivity of 8.01 x 10{sup -4} {Omega} cm. However, after annealing at 450 C in air, the electrical resistivity of the AZO films increased to 1.97 x 10{sup -1} {Omega} cm because of a decrease in the carrier concentration. Subsequent annealing of the air-annealed AZO films in H{sub 2} recovered the electrical conductivity of the AZO films. In addition, the conductivity change was reversible upon repeated air and H{sub 2} annealing. A photoluminescence study showed that oxygen interstitial (O{sub i}) is a critical material parameter allowing for the reversible control of the electrical conducting properties of AZO films.

  12. Recent advances in high-resolution X-ray diffractometry applied to nanostructured oxide thin films: The case of yttria stabilized zirconia epitaxially grown on sapphire

    NASA Astrophysics Data System (ADS)

    Boulle, A.; Guinebretière, R.; Masson, O.; Bachelet, R.; Conchon, F.; Dauger, A.

    2006-10-01

    The investigation of nanostructured oxide thin films using high-resolution X-ray diffraction (XRD) is considered. Because of the small amount of matter deposited and significant defect densities, such oxide thin film structures can be considered as imperfect materials that require specific data acquisition and data analysis methods. Fast reciprocal space mapping is carried out using a diffractometer based on an 18 kW X-ray source, a four-reflection monochromator and a curved position sensitive detector. In order to extract quantitative information concerning the microstructure of the films, an approach is developed that combines a microscopic modelling of dimensional effects (crystallite or island shape, size and size distribution) with a phenomenological description of lattice disorder. Within this approach, simple analytical expressions or expressions implying a simple Fourier transform, can be derived for the XRD intensity distribution in the direction perpendicular to the film surface and parallel to it. Profiles exhibiting damped and/or broadened fringes and profiles exhibiting a two-component line shape can be simulated. Parameters of primary interest, such as the island thickness, thickness distribution function, island in-plane dimensions and the distribution function of the dimensions, the level of disorder, the disorder correlation length and the spatial distribution of disorder, can be extracted. The applicability of the model is illustrated with yttria stabilized zirconia films epitaxially grown on sapphire by sol-gel dip-coating.

  13. Effects of O2 plasma post-treatment on ZnO: Ga thin films grown by H2O-thermal ALD

    NASA Astrophysics Data System (ADS)

    Lee, Yueh-Lin; Chuang, Jia-Hao; Huang, Tzu-Hsuan; Ho, Chong-Long; Wu, Meng-Chyi

    2013-03-01

    Transparent conducting oxides have been widely employed in optoelectronic devices using the various deposition methods such as sputtering, thermal evaporator, and e-gun evaporator technologies.1-3 In this work, gallium doped zinc oxide (ZnO:Ga) thin films were grown on glass substrates via H2O-thermal atomic layer deposition (ALD) at different deposition temperatures. ALD-GZO thin films were constituted as a layer-by-layer structure by stacking zinc oxides and gallium oxides. Diethylzinc (DEZ), triethylgallium (TEG) and H2O were used as zinc, gallium precursors and oxygen source, respectively. Furthermore, we investigated the influences of O2 plasma post-treatment power on the surface morphology, electrical and optical property of ZnO:Ga films. As the result of O2 plasma post-treatment, the characteristics of ZnO:Ga films exhibit a smooth surface, low resistivity, high carrier concentration, and high optical transmittance in the visible spectrum. However, the transmittance decreases with O2 plasma power in the near- and mid-infrared regions.

  14. Zinc-blende MnAs thin films directly grown on InP (001) substrates as possible source of spin-polarized current

    NASA Astrophysics Data System (ADS)

    Oomae, Hiroto; Asubar, Joel T.; Nakamura, Shinichi; Jinbo, Yoshio; Uchitomi, Naotaka

    2012-01-01

    We have directly grown zinc-blende (zb)-type MnAs thin films on InP (001) substrates without the aid of any buffer layer using molecular beam epitaxy (MBE). From the High-resolution X-ray diffraction (XRD) data, assuming face-centered cubic (fcc) MnAs structure, the average lattice constants values were calculated to be 6.068 and 6.060 Å for growth temperatures of 250 and 300 °C, respectively. High-resolution transmission electron microscopy (TEM) investigations and selected-area electron-diffraction (SAD) verified the successful growth of zb-type cubic MnAs coexisting with the NiAs-type hexagonal MnAs. The saturation magnetization was estimated to be 300 emu/cm 3 determined from the magnetic field dependence of the magnetization curves. From the temperature dependence of magnetization, the Curie temperature was found to be approximately 308 K. Success in the growth of zb-type MnAs thin films could be reasonably explained by the existence of a monolayer of InAs at the interface between the MnAs and InP substrates.

  15. CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES: Structural and Electrical Properties of Single Crystalline Ga-Doped ZnO Thin Films Grown by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Lu, Zhong-Lin; Zou, Wen-Qin; Xu, Ming-Xiang; Zhang, Feng-Ming; Du, You-Wei

    2009-11-01

    High-quality Ga-doped ZnO (ZnO:Ga) single crystalline films with various Ga concentrations are grown on a-plane sapphire substrates using molecular-beam epitaxy. The site configuration of doped Ga atoms is studied by means of x-ray absorption spectroscopy. It is found that nearly all Ga can substitute into ZnO lattice as electrically active donors, a generating high density of free carriers with about one electron per Ga dopant when the Ga concentration is no more than 2%. However, further increasing the Ga doping concentration leads to a decrease of the conductivity due to partial segregation of Ga atoms to the minor phase of the spinel ZnGa2O4 or other intermediate phase. It seems that the maximum solubility of Ga in the ZnO single crystalline film is about 2 at.% and the lowest resistivity can reach 1.92 × 10-4 Ω·cm at room temperature, close to the best value reported. In contrast to ZnO:Ga thin film with 1% or 2% Ga doping, the film with 4% Ga doping exhibits a metal semiconductor transition at 80 K. The scattering mechanism of conducting electrons in single crystalline ZnO:Ga thin film is discussed.

  16. AgGaSe2 thin films grown by chemical close-spaced vapor transport for photovoltaic applications: structural, compositional and optical properties

    NASA Astrophysics Data System (ADS)

    Merschjann, C.; Mews, M.; Mete, T.; Karkatzinou, A.; Rusu, M.; Korzun, B. V.; Schorr, S.; Schubert-Bischoff, P.; Seeger, S.; Schedel-Niedrig, Th; Lux-Steiner, M.-Ch

    2012-05-01

    Thin films of chalcopyrite AgGaSe2 have been successfully grown on glass and glass/molybdenum substrates using the technique of chemical close-spaced vapor transport. The high crystallinity of the samples is confirmed by grazing-incidence x-ray diffraction, scanning and transmission electron microscopy, and optical transmission/reflection spectroscopy. Here, two of the three expected direct optical bandgaps are found at 1.77(2) and 1.88(6) eV at 300 K. The lowest bandgap energy at 4 K is estimated to be 1.82(3) eV. Photoluminescence spectroscopy has further revealed the nature of the point defects within the AgGaSe2, showing evidence for the existence of very shallow acceptor levels of 5(1) and 10(1) meV, and thus suggesting the AgGaSe2 phase itself to exhibit a p-type conductivity. At the same time, electrical characterization by Hall, Seebeck and four-point-probe measurements indicate properties of a compensated semiconductor. The electrical properties of the investigated thin films are mainly influenced by the presence of Ag2Se and Ga2O3 nanometer-scaled surface layers, as well as by Ag2Se inclusions in the bulk and Ag clusters at the layers’ rear side.

  17. KTa0.65Nb0.35O3 thin films epitaxially grown by pulsed laser deposition on metallic and oxide epitaxial electrodes

    NASA Astrophysics Data System (ADS)

    Bouyasfi, A.; Mouttalie, M.; Demange, V.; Gautier, B.; Grandfond, A.; Députier, S.; Ollivier, S.; Hamedi, L.'H.; Guilloux-Viry, M.

    2012-09-01

    Ferroelectric KTa0.65Nb0.35O3 (KTN) thin films were grown by pulsed laser deposition on Pt and LaNiO3 epitaxial electrodes, on (1 0 0) and (1 1 0) SrTiO3 substrates. The effect of the nature of the electrode on structural and microstructural quality of KTN films was investigated. While epitaxial KTN thin films were successfully obtained on both electrodes, two orientations compete on Pt, whatever the main orientation of Pt is (1 0 0) or (1 1 0). On LaNiO3 in contrast, pure (1 0 0) and (1 1 0) oriented KTN films were achieved with a high crystalline quality illustrated by narrow ω-scans (Δω = 0.56° and Δω = 0.80° for (1 0 0) and (1 1 0) KTN, to be compared to 0.048° and 0.22° for (1 0 0) and (1 1 0) LaNiO3, respectively). Electrical measurements performed in tunneling atomic force microscopy (TUNA mode) on a KTN/Pt heterostructure showed a high asymmetry of the conduction mechanisms when a positive or a negative bias is applied on the sample. In particular leakage currents appear even at very low positive applied voltage. TUNA imaging operated at a moderate negative applied voltage of -3 V shows that some areas corresponding to grain boundaries seem to be more leaky than others.

  18. Structural and optical analyses of AlxGa1-xN thin films grown by metal organic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Kucukgok, Bahadir; Lu, Na; Ferguson, Ian T.; Wang, Shu Chang; Zhang, Xiong; Feng, Zhe Chuan

    2015-02-01

    A series of AlxGa1-xN thin films with x = 0.20-0.60 were grown by metal organic chemical vapor deposition (MOCVD) on sapphire (0001) substrate using AlN buffer layer. High resolution X-ray diffraction (HRXRD) was performed for (0002), (0004), and (0006) reflections to investigate the threading dislocation density in variation with Al composition by X-ray analysis technique; Williamson-Hall (WH) plot. A symmetric high resolution 2θ-ω scans exhibit high crystal quality for all the AlGaN samples. A room temperature deep ultraviolet (DUV) photoluminescence (PL) spectroscopy (excitation at 248 nm) has also been employed to investigate the effect of various Al compositions on crystal structure of the thin film layers. It was observed that the band edge transition peak energy blueshifts from 3.87 eV for x = 0.23 to 4.55 eV for x = 0.47. In addition to the band edge transition, each spectrum also shows deep impurity transitions.

  19. Tuning of near-infrared luminescence of SrTiO3:Ni2+ thin films grown on piezoelectric PMN-PT via strain engineering

    PubMed Central

    Bai, Gongxun; Zhang, Yang; Hao, Jianhua

    2014-01-01

    We report the tunable near-infrared luminescence of Ni2+ doped SrTiO3 (STO:Ni) thin film grown on piezoelectric Pb(Mg1/3Nb2/3)0.7Ti0.3O3 (PMN-PT) substrate via strain engineering differing from conventional chemical approach. Through controlling the thickness of STO:Ni film, the luminescent properties of the films including emission wavelength and bandwidth, as well as lifetime can be effectively tuned. The observed phenomena can be explained by the variation in the crystal field around Ni2+ ions caused by strain due to the lattice mismatch. Moreover, the modulation of strain can be controlled under an external electric field via converse piezoelectric effect of PMN-PT used in this work. Consequently, controllable emission of the STO:Ni thin film is demonstrated in a reversible and real-time way, arising from the biaxial strain produced by piezoelectric PMN-PT. Physical mechanism behind the observation is discussed. This work will open a door for not only investigating the luminescent properties of the phosphors via piezoelectric platform, but also potentially developing novel planar light sources. PMID:25030046

  20. Tuning of near-infrared luminescence of SrTiO3:Ni2+ thin films grown on piezoelectric PMN-PT via strain engineering

    NASA Astrophysics Data System (ADS)

    Bai, Gongxun; Zhang, Yang; Hao, Jianhua

    2014-07-01

    We report the tunable near-infrared luminescence of Ni2+ doped SrTiO3 (STO:Ni) thin film grown on piezoelectric Pb(Mg1/3Nb2/3)0.7Ti0.3O3 (PMN-PT) substrate via strain engineering differing from conventional chemical approach. Through controlling the thickness of STO:Ni film, the luminescent properties of the films including emission wavelength and bandwidth, as well as lifetime can be effectively tuned. The observed phenomena can be explained by the variation in the crystal field around Ni2+ ions caused by strain due to the lattice mismatch. Moreover, the modulation of strain can be controlled under an external electric field via converse piezoelectric effect of PMN-PT used in this work. Consequently, controllable emission of the STO:Ni thin film is demonstrated in a reversible and real-time way, arising from the biaxial strain produced by piezoelectric PMN-PT. Physical mechanism behind the observation is discussed. This work will open a door for not only investigating the luminescent properties of the phosphors via piezoelectric platform, but also potentially developing novel planar light sources.

  1. Tuning of near-infrared luminescence of SrTiO3:Ni2+ thin films grown on piezoelectric PMN-PT via strain engineering.

    PubMed

    Bai, Gongxun; Zhang, Yang; Hao, Jianhua

    2014-01-01

    We report the tunable near-infrared luminescence of Ni(2+) doped SrTiO3 (STO:Ni) thin film grown on piezoelectric Pb(Mg(1/3)Nb(2/3))(0.7)Ti(0.3)O3 (PMN-PT) substrate via strain engineering differing from conventional chemical approach. Through controlling the thickness of STO:Ni film, the luminescent properties of the films including emission wavelength and bandwidth, as well as lifetime can be effectively tuned. The observed phenomena can be explained by the variation in the crystal field around Ni(2+) ions caused by strain due to the lattice mismatch. Moreover, the modulation of strain can be controlled under an external electric field via converse piezoelectric effect of PMN-PT used in this work. Consequently, controllable emission of the STO:Ni thin film is demonstrated in a reversible and real-time way, arising from the biaxial strain produced by piezoelectric PMN-PT. Physical mechanism behind the observation is discussed. This work will open a door for not only investigating the luminescent properties of the phosphors via piezoelectric platform, but also potentially developing novel planar light sources. PMID:25030046

  2. AgGaSe2 thin films grown by chemical close-spaced vapor transport for photovoltaic applications: structural, compositional and optical properties.

    PubMed

    Merschjann, C; Mews, M; Mete, T; Karkatzinou, A; Rusu, M; Korzun, B V; Schorr, S; Schubert-Bischoff, P; Seeger, S; Schedel-Niedrig, Th; Lux-Steiner, M-Ch

    2012-05-01

    Thin films of chalcopyrite AgGaSe(2) have been successfully grown on glass and glass/molybdenum substrates using the technique of chemical close-spaced vapor transport. The high crystallinity of the samples is confirmed by grazing-incidence x-ray diffraction, scanning and transmission electron microscopy, and optical transmission/reflection spectroscopy. Here, two of the three expected direct optical bandgaps are found at 1.77(2) and 1.88(6) eV at 300 K. The lowest bandgap energy at 4 K is estimated to be 1.82(3) eV. Photoluminescence spectroscopy has further revealed the nature of the point defects within the AgGaSe(2), showing evidence for the existence of very shallow acceptor levels of 5(1) and 10(1) meV, and thus suggesting the AgGaSe(2) phase itself to exhibit a p-type conductivity. At the same time, electrical characterization by Hall, Seebeck and four-point-probe measurements indicate properties of a compensated semiconductor. The electrical properties of the investigated thin films are mainly influenced by the presence of Ag(2)Se and Ga(2)O(3) nanometer-scaled surface layers, as well as by Ag(2)Se inclusions in the bulk and Ag clusters at the layers' rear side. PMID:22469870

  3. Characterization of CuInS2 thin films prepared from materials grown by using the mechanochemical method and their photovoltaic applications

    NASA Astrophysics Data System (ADS)

    Akaki, Yoji; Sugimoto, Kanta; Nakamura, Shigeyuki; Yamaguchi, Toshiyuki; Yoshino, Kenji

    2015-08-01

    Cu-In-S thin films were deposited on glass substrates using single-source thermal evaporation with ternary compounds as source materials. Polycrystalline CuInS2 powder grown using the mechanochemical method was employed as the source material. After deposition, the films were annealed in H2S gas at different temperatures from 250 to 500 °C for 60 min. X-ray diffraction patterns indicated that single-phase CuInS2 was formed when annealed above 400 °C. The grain size of the crystals in thin films was approximately 0.2 to 2.0 µm. The best Al/ZnO:Al/ZnO/CdS/CuInS2/Mo solar cell had an open-circuit voltage of 360 mV, a short-circuit current density of 18.6 mA/cm2, and a fill factor of 35.5%, resulting in 2.38% efficiency.

  4. Far-infrared transmission in GaN, AlN, and AlGaN thin films grown by molecular beam epitaxy

    SciTech Connect

    Ibanez, J.; Hernandez, S.; Alarcon-Llado, E.; Cusco, R.; Artus, L.; Novikov, S. V.; Foxon, C. T.; Calleja, E.

    2008-08-01

    We present a far-infrared transmission study on group-III nitride thin films. Cubic GaN and AlN layers and c-oriented wurtzite GaN, AlN, and Al{sub x}Ga{sub 1-x}N (x<0.3) layers were grown by molecular beam epitaxy on GaAs and Si(111) substrates, respectively. The Berreman effect allows us to observe simultaneously the transverse optic and the longitudinal optic phonons of both the cubic and the hexagonal films as transmission minima in the infrared spectra acquired with obliquely incident radiation. We discuss our results in terms of the relevant electromagnetic theory of infrared transmission in cubic and wurtzite thin films. We compare the infrared results with visible Raman-scattering measurements. In the case of films with low scattering volumes and/or low Raman efficiencies and also when the Raman signal of the substrate material obscures the weaker peaks from the nitride films, we find that the Berreman technique is particularly useful to complement Raman spectroscopy.

  5. Tailoring Energy Bandgap of Al Doped ZnO Thin Films Grown by Vacuum Thermal Evaporation Method.

    PubMed

    Vyas, Sumit; Singh, Shaivalini; Chakrabarti, P

    2015-12-01

    The paper presents the results of our experimental investigation pertaining to tailoring of energy bandgap and other associated characteristics of undoped and Al doped ZnO (AZO) thin film by varying the atomic concentration of Al in ZnO. Thin films of ZnO and ZnO doped with Al (1, 3, and 5 atomic percent (at.%)) were deposited on silicon substrate for structural characterization and on glass substrate for optical characterization. The dependence of structural and optical properties of Al doped ZnO on the atomic concentration of Al added to ZnO has been reported. On the basis of the experimental results an empirical formula has been proposed to calculate the energy bandgap of AZO theoretically in the range of 1 to 5 at.% of Al. The study revealed that AZO films are composed of smaller and larger number of grains as compared to pure ZnO counterpart and density of the grains was found to increase as the Al concentration increased (from 1 to 5 at.%). The transmittance in the visible region was greater than 90% and found to increase with increasing Al concentration up to 5 at.%. The optical bandgap was found to increase initially with increase in atomic concentration of Al concentration up to 3 at.% and decrease thereafter with increasing concentration of Al. PMID:26682390

  6. Effect of substrate temperature on structure and luminescence properties of YVO4:Eu3+ thin films grown by PLD

    NASA Astrophysics Data System (ADS)

    Foka, K. E.; Dejene, B. F.; Swart, H. C.

    2016-03-01

    YVO4:Eu3+ thin films were deposited by pulse laser deposition at substrate temperatures of 200, 300 and 400 °C. The oxygen deposition background pressure was also changed from 20 to 85 mTorr at a substrate temperature of 400 °C. The films deposited at the higher temperatures showed a tetragonal phase in consistent with the standard JCPDS card 17-0341. The X-ray diffraction patterns obtained from the 200 °C sample showed only a very small peak at the (200) orientation. The other phosphor thin film showed an improved crystalline structure when the temperature was increased. Scanning electron microscope images indicated larger particles on the surface at the higher temperatures. Atomic force microscopy results showed smooth surfaces with small particles at lower temperatures and an increase in surface roughness at higher temperatures due to the improvement in crystallinity. The photoluminescence showed the typical emission peaks of Eu3+ in the red region at 594 and 618 nm attributed to the 5D0-7F1 and 5D0-7F2 transitions. The peaks at 652 and 699 nm corresponding to the 5D0-7F3 and 5D0-7F4 transitions were also observed. The spectra showed an increase in PL intensity when the deposition temperature and oxygen pressure were increased.

  7. Characterization of two different orientations of epitaxial niobium thin films grown on MgO(001) surfaces

    NASA Astrophysics Data System (ADS)

    Beringer, D. B.; Roach, W. M.; Clavero, C.; Reece, C. E.; Lukaszew, R. A.

    2013-12-01

    Epitaxial Nb thin films deposited onto the same crystalline insulating surface can evolve in very different fashions depending on specific deposition conditions, thereby affecting their microstructure, surface morphology and superconducting properties. Here, we examine and compare the microstructure and ensuing surface morphology from two distinct Nb/MgO series each with its own epitaxial registry—namely Nb(001)/MgO(001) and Nb(110)/MgO(001)—leading to distinct surface anisotropy and we closely examine the dynamical scaling of the surface features during growth. We compare our findings with those in other metal/MgO epitaxial systems and for the first time, general scaling formalism is applied to analyze anisotropic surfaces exhibiting biaxial symmetry. Further, Power Spectral Density is applied to the specific problem of thin film growth and surface evolution to qualify the set of deposition conditions leading to smoother surfaces. We find good correlation between the surface morphology and microstructure of the various Nb films with superconducting properties such as their residual resistance ratio and lower critical field.

  8. Characterization of two different orientations of epitaxial niobium thin films grown on MgO(001) surfaces

    SciTech Connect

    Beringer, Douglas B.; Roach, William M.; Clavero Perez, Cesar; Reece, Charles E.; Lukaszew, Rosa

    2013-12-01

    Epitaxial Nb thin films deposited onto the same crystalline insulating surface can evolve in very different fashions depending on specific deposition conditions, thereby affecting their microstructure, surface morphology and superconducting properties. Here, we examine and compare the microstructure and ensuing surface morphology from two distinct Nb/MgO series each with its own epitaxial registry?namely Nb(001)/MgO(001) and Nb(110)/MgO(001)?leading to distinct surface anisotropy and we closely examine the dynamical scaling of the surface features during growth. We compare our findings with those in other metal/MgO epitaxial systems and for the first time, general scaling formalism is applied to analyze anisotropic surfaces exhibiting biaxial symmetry. Further, Power Spectral Density is applied to the specific problem of thin film growth and surface evolution to qualify the set of deposition conditions leading to smoother surfaces. We find good correlation between the surface morphology and microstructure of the various Nb films with superconducting properties such as their residual resistance ratio and lower critical field.

  9. Influence of different aspect ratios on the structural and electrical properties of GaN thin films grown on nanoscale-patterned sapphire substrates

    NASA Astrophysics Data System (ADS)

    Lee, Fang-Wei; Ke, Wen-Cheng; Cheng, Chun-Hong; Liao, Bo-Wei; Chen, Wei-Kuo

    2016-07-01

    This study presents GaN thin films grown on nanoscale-patterned sapphire substrates (NPSSs) with different aspect ratios (ARs) using a homemade metal-organic chemical vapor deposition system. The anodic aluminum oxide (AAO) technique is used to prepare the dry etching mask. The cross-sectional view of the scanning electron microscope image shows that voids exist between the interface of the GaN thin film and the high-AR (i.e. ∼2) NPSS. In contrast, patterns on the low-AR (∼0.7) NPSS are filled full of GaN. The formation of voids on the high-AR NPSS is believed to be due to the enhancement of the lateral growth in the initial growth stage, and the quick-merging GaN thin film blocks the precursors from continuing to supply the bottom of the pattern. The atomic force microscopy images of GaN on bare sapphire show a layer-by-layer surface morphology, which becomes a step-flow surface morphology for GaN on a high-AR NPSS. The edge-type threading dislocation density can be reduced from 7.1 × 108 cm-2 for GaN on bare sapphire to 4.9 × 108 cm-2 for GaN on a high-AR NPSS. In addition, the carrier mobility increases from 85 cm2/Vs for GaN on bare sapphire to 199 cm2/Vs for GaN on a high-AR NPSS. However, the increased screw-type threading dislocation density for GaN on a low-AR NPSS is due to the competition of lateral growth on the flat-top patterns and vertical growth on the bottom of the patterns that causes the material quality of the GaN thin film to degenerate. Thus, the experimental results indicate that the AR of the particular patterning of a NPSS plays a crucial role in achieving GaN thin film with a high crystalline quality.

  10. RBS study of epitaxially grown thin films of the double perovskite La 2NiMnO 6

    NASA Astrophysics Data System (ADS)

    Budak, S.; Muntele, C.; Muntele, I.; Guo, H.; Gupta, A.; Ila, D.

    2007-08-01

    Epitaxial thin films of La2NiMnO6, a ferromagnetic semiconductor, have been fabricated on different substrates by pulsed laser deposition (PLD) [H. Guo, J. Burgess, S. Street, A. Gupta, T.G. Calvarese, M.A. Subramanian, Appl. Phys. Lett. 89 (2006) 0225509]. X-ray diffraction and Raman scattering observations show that the films are single crystalline and have an orthorhombic structure. Rutherford backscattering spectrometry (RBS) measurements were done on four different samples using 2.1 MeV He+ ions. We used RUMP simulation on the RBS data to extract information about the thickness and stoichiometry of the layers. In this paper, we are discussing the differences of the various films investigated.

  11. High Frequency FMR spectroscopy of Thin MnAs Epilayers grown on (111) and (100) GaAs

    NASA Astrophysics Data System (ADS)

    Cubukcu, M.; von Bardeleben, H. J.; Cantin, J. L.; Wilson, M. J.; Rench, D.; Schiffer, P.; Samarth, N.

    2010-03-01

    The magnetic anisotropies of thin ferromagnetic epilayers can be conveniently studied by ferromagnetic resonance spectroscopy [1] with 9 or 35 GHz spectrometers. The case of α-MnAs -- a metallic ferromagnet of interest for hybrid semiconductor spintronics -- presents technical challenges because the large structure-related anisotropy field limits such measurements to close to easy axis orientation. We have overcome this difficulty by applying high frequency FMR at 115 GHz with magnetic fields up to 11 T. This allows us to map out complete angular variation patterns and to thus deduce the corresponding anisotropy constants. We report on a systematic investigation of the influence of epilayer thickness and temperature on the magnetic anisotropy.[4pt] [1] Kh.Khazen et al, Phys.Rev.B bf 77, 165204 (2008).

  12. Strain distribution of thin InN epilayers grown on (0001) GaN templates by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Delimitis, A.; Komninou, Ph.; Dimitrakopulos, G. P.; Kehagias, Th.; Kioseoglou, J.; Karakostas, Th.; Nouet, G.

    2007-02-01

    A structural characterization of thin InN films is performed to determine the post-growth strain distribution, using electron microscopy techniques. A 60° misfit dislocation network at the InN /GaN interface effectively accommodates the lattice mismatch. The InN in-plane lattice parameter, which remained practically constant throughout the epilayer thickness, was precisely determined by electron diffraction analysis, and cross-section and plan-view lattice images. Image analysis using the geometric phase and projection methods revealed a uniform distribution of the residual tensile strain along the growth and lateral directions. The in-plane strain is primarily attributed to InN island coalescence during the initial stages of growth.

  13. Deposition And Characterization of (Ti,Zr)N Thin Films Grown Through PAPVD By The Pulsed Arc Technique

    SciTech Connect

    Marulanda, D. M.; Trujillo, O.; Devia, A.

    2006-12-04

    The Plasma Assisted Physic Vapor Deposition (PAPVD) by the pulsed arc technique has been used for deposition of Titanium Zirconium Nitride (Ti,Zr)N coatings, using a segmented target of TiZr. The deposition was performed in a vacuum chamber with two faced electrodes (target and substrate) using nitrogen as working gas, and a power-controlled source used to produce the arc discharges. Films were deposited on stainless steel 304, and they were characterized using the X-Ray Photoelectron Spectroscopy (XPS), X-Ray Diffraction (XRD), Energy Dispersion Spectroscopy (EDS) and Scanning Probe Microscopy (SPM) techniques. The XRD patterns show different planes in which the film grows. Through SPM, using Atomic Force Microscopy (AFM) and Lateral Force Microscopy (LFM) modes, a nanotribologic study of the thin film was made, determining hardness and friction coefficient.

  14. Structural and electrical properties of epitaxial Bi2Se3 thin films grown by hybrid physical-chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Brom, Joseph E.; Ke, Yue; Du, Renzhong; Won, Dongjin; Weng, Xiaojun; Andre, Kalissa; Gagnon, Jarod C.; Mohney, Suzanne E.; Li, Qi; Chen, Ke; Xi, X. X.; Redwing, Joan M.

    2012-04-01

    We report the epitaxial growth of Bi2Se3 thin films on (0001) Al2O3 substrates by hybrid physical-chemical vapor deposition (HPCVD). The HPCVD technique combines the thermal decomposition of trimethylbismuth with the thermal evaporation of Se and leads to a high Se partial pressure in the growth ambient. The Bi2Se3 films are highly c-axis oriented on sapphire but contain planar defects including stacking faults and twin boundaries. Variable-temperature Hall-effect measurements demonstrate a carrier concentration of 5.8 × 1018 cm-3 and a mobility of 900 cm2/Vs at 4.2 K. These results demonstrate the potential of HPCVD for producing high quality Bi2Se3 films for topological insulator studies.

  15. Solution-grown small-molecule organic semiconductor with enhanced crystal alignment and areal coverage for organic thin film transistors

    DOE PAGESBeta

    Bi, Sheng; He, Zhengran; Chen, Jihua; Li, Dawen

    2015-07-24

    Drop casting of small-molecule organic semiconductors typically forms crystals with random orientation and poor areal coverage, which leads to significant performance variations of organic thin-film transistors (OTFTs). In this study, we utilize the controlled evaporative self-assembly (CESA) method combined with binary solvent system to control the crystal growth. A small-molecule organic semiconductor,2,5-Di-(2-ethylhexyl)-3,6-bis(5"-n-hexyl-2,2',5',2"]terthiophen-5-yl)-pyrrolo[3,4-c]pyrrole-1,4-dione (SMDPPEH), is used as an example to demonstrate the effectiveness of our approach. By optimizing the double solvent ratios, well-aligned SMDPPEH crystals with significantly improved areal coverage were achieved. As a result, the SMDPPEH based OTFTs exhibit a mobility of 1.6 × 10-2 cm2/V s, which is themore » highest mobility from SMDPPEH ever reported.« less

  16. Ultra-narrow ferromagnetic resonance in organic-based thin films grown via low temperature chemical vapor deposition

    SciTech Connect

    Yu, H.; Harberts, M.; Adur, R.; Hammel, P. Chris; Johnston-Halperin, E. E-mail: epstein@physics.osu.edu; Lu, Y.; Epstein, A. J. E-mail: epstein@physics.osu.edu

    2014-07-07

    We present the growth of thin films of the organic-based ferrimagnetic semiconductor V[TCNE]{sub x} (x ∼ 2, TCNE: tetracyanoethylene) via chemical vapor deposition. Under optimized growth conditions, we observe a significant increase in magnetic homogeneity, as evidenced by a Curie temperature above 600 K and sharp magnetization switching. Further, ferromagnetic resonance studies reveal a single resonance with full width at half maximum linewidth of 1.4 G, comparable to the narrowest lines measured in inorganic magnetic materials and in contrast to previous studies that showed multiple resonance features. These characteristics are promising for the development of high frequency electronic devices that take advantage of the unique properties of this organic-based material, such as the potential for low cost synthesis combined with low temperature and conformal deposition on a wide variety of substrates.

  17. Structural and magnetic properties of epitaxial delafossite CuFeO{sub 2} thin films grown by pulsed laser deposition

    SciTech Connect

    Joshi, Toyanath; Senty, Tess R.; Trappen, Robbyn; Zhou, Jinling; Borisov, Pavel; Holcomb, Mikel B.; Bristow, Alan D.; Lederman, David; Chen, Song; Song, Xueyan; Ferrari, Piero; Cabrera, Alejandro L.

    2015-01-07

    Growth of pure phase delafossite CuFeO{sub 2} thin films on Al{sub 2}O{sub 3} (00.1) substrates by pulsed laser deposition was systematically investigated as a function of growth temperature and oxygen pressure. X-ray diffraction, transmission electron microscopy, Raman scattering, and x-ray absorption spectroscopy confirmed the existence of the delafossite phase. Infrared reflectivity spectra determined a band edge at 1.15 eV, in agreement with the bulk delafossite data. Magnetization measurements on CuFeO{sub 2} films demonstrated a phase transition at T{sub C} ≈ 15 ± 1 K, which agrees with the first antiferromagnetic transition at 14 K in the bulk CuFeO{sub 2}. Low temperature magnetic phase is best described by commensurate, weak ferromagnetic spin ordering along the c-axis.

  18. Large-area uniform graphene-like thin films grown by chemical vapor deposition directly on silicon nitride

    NASA Astrophysics Data System (ADS)

    Sun, Jie; Lindvall, Niclas; Cole, Matthew T.; Teo, Kenneth B. K.; Yurgens, August

    2011-06-01

    Large-area uniform carbon films with graphene-like properties are synthesized by chemical vapor deposition directly on Si3N4/Si at 1000 °C without metal catalysts. The as deposited films are atomically thin and wrinkle- and pinhole-free. The film thickness can be controlled by modifying the growth conditions. Raman spectroscopy confirms the sp2 graphitic structures. The films show ohmic behavior with a sheet resistance of ˜2.3-10.5 kΩ/◻ at room temperature. An electric field effect of ˜2-10% (VG=-20 V) is observed. The growth is explained by the self-assembly of carbon clusters from hydrocarbon pyrolysis. The scalable and transfer-free technique favors the application of graphene as transparent electrodes.

  19. Study of high {Tc} superconducting thin films grown by MOCVD. Final report, July 1, 1986--April 30, 1990

    SciTech Connect

    Erbil, A.

    1990-12-31

    Work is described briefly, which was carried out on development of techniques to grow metal-semiconductor superlattices (artificially layered materials) and on the copper oxide based susperconductors (naturally layered materials). The current growth technique utilized is metalorganic chemical vapor deposition (MOCVD). CdTe, PbTe, La, LaTe, and Bi{sub 2}Te{sub 3} were deposited, mostly on GaAs. Several YBa{sub 2}Cu{sub 3}O{sub 7} compounds were obtained with possible superconductivity at temperatures up to 550 K (1 part in 10{sup 4}). YBa{sub 2}Cu{sub 3}O{sub 7{minus}x} and Tl{sub 2}CaBa{sub 2}Cu{sub 2}O{sub y} thin films were deposited by MOCVD on common substrates such as glass.

  20. Solution-grown small-molecule organic semiconductor with enhanced crystal alignment and areal coverage for organic thin film transistors

    SciTech Connect

    Bi, Sheng; He, Zhengran; Chen, Jihua; Li, Dawen

    2015-07-24

    Drop casting of small-molecule organic semiconductors typically forms crystals with random orientation and poor areal coverage, which leads to significant performance variations of organic thin-film transistors (OTFTs). In this study, we utilize the controlled evaporative self-assembly (CESA) method combined with binary solvent system to control the crystal growth. A small-molecule organic semiconductor,2,5-Di-(2-ethylhexyl)-3,6-bis(5"-n-hexyl-2,2',5',2"]terthiophen-5-yl)-pyrrolo[3,4-c]pyrrole-1,4-dione (SMDPPEH), is used as an example to demonstrate the effectiveness of our approach. By optimizing the double solvent ratios, well-aligned SMDPPEH crystals with significantly improved areal coverage were achieved. As a result, the SMDPPEH based OTFTs exhibit a mobility of 1.6 × 10-2 cm2/V s, which is the highest mobility from SMDPPEH ever reported.

  1. Defect study of molecular beam epitaxy grown undoped GaInNAsSb thin film using junction-capacitance spectroscopy

    SciTech Connect

    Monirul Islam, Muhammad; Miyashita, Naoya; Ahsan, Nazmul; Okada, Yoshitaka

    2013-02-18

    Defects in undoped GaInNAsSb thin film (i-GaInNAsSb) were investigated by junction-capacitance technique using admittance and transient photocapacitance (TPC) spectroscopy. An electron trap D2 was identified at 0.34 eV below the conduction band (E{sub C}) of i-GaInNAsSb using admittance spectroscopy. Optical transition of valance band (E{sub V}) electrons to a localized state OH1 (E{sub V} + 0.75 eV) was manifested in negative TPC signal. Combined activation energy of OH1 and D2 defect corresponds to the band-gap of i-GaInNAsSb, suggesting that OH1/D2 acts as an efficient recombination center. TPC signal at {approx}1.59 eV above E{sub V} was attributed to the nitrogen-induced localized state in GaInNAsSb.

  2. Structural and morphological studies on Bi1-xCaxMnO3 thin films grown by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Pugazhvadivu, K. S.; Santhiya, M.; Balakrishnan, L.; Tamilarasan, K.

    2016-05-01

    Bi1-xCaxMnO3 (0 ≤ X ≤ 0.4) thin films are deposited on n-type Si (100) substrate at 800 °C by RF magnetron sputtering. X-ray diffraction pattern shows that the films are crystallized in monoclinic structure with C2 space group. The crystallite size and induced strain in the prepared films are measured by W-H plot. The cell parameters and texture coefficient of the films are calculated. The surface morphology of the films is examined by atomic force microscope. The study confirms the optimum level of calcium doping is 20 at. % in Bi site of BiMnO3 film, these findings pave the way for further research in the Ca modified BiMnO3 films towards device fabrication.

  3. Comparative study on the thickness-dependent properties of ITO and GZO thin films grown on glass and PET substrates

    NASA Astrophysics Data System (ADS)

    Kim, J. S.; Park, J.-K.; Baik, Y. J.; Kim, W. M.; Jeong, J.; Seong, T.-Y.

    2012-11-01

    The thickness-dependent properties of amorphous Sn-doped In2O3 (ITO) and polycrystalline Ga-doped ZnO (GZO) films grown on polyethylene terephthalate (PET) with a polymeric hard coating were compared with those deposited on Corning glass. The film thickness varied from 20 to 1310 nm. The electrical properties of the ITO films on PET were almost similar to those of the ITO films on glass. On the other hand, GZO films showed slightly poorer electrical properties when deposited on PET, but the difference was marginal. The electrical properties of amorphous ITO films were independent of film thickness, but polycrystalline GZO films exhibited monotonicallyimproving behavior with increasing thickness, mainly due to enhanced crystallinity and increased grain size with increasing film thickness. Although the air-referenced transmittance spectra of films on PET were about 2-3% lower than those on glass due to the lower transmittance of PET, the substrate-referenced optical transmittances of films on PET were higher than those on glass, reflecting the somewhat coarse structure of films on PET. Both the ITO and the GZO films on PET with a polymeric hard coating were shown to yield properties comparable to those oof both films on glass.

  4. Boron nitride phosphide thin films grown on quartz substrate by hot-filament and plasma-assisted chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Zhang, X. W.; Xu, S. Y.; Han, G. R.

    2004-10-01

    Boron nitride phosphide films are, for the first time, grown on transparent quartz substrate by hot filament and radio-frequency plasma co-assisted chemical vapor deposition technique. XPS, XRD, SEM, and UV measurements are performed to study the chemical composition, crystallization, microstructure, and optical absorption, respectively. A centipede-like microstructure and undulating ground morphology on the film surface are observed, and their growth mechanism is speculated upon. The chemical composition is determined as BN1-xPx, whose characteristic XRD peak is preliminarily identified. The optical band gap can be modulated between 5.52 eV and 3.74 eV, simply by adjusting the phosphorus content in BN1-xPx through modifying the PH3 flux during the film-deposition process. The merits of the BN1-xPx film, such as high ultraviolet photoelectric sensitivity with negligible sensitivity in the visible region, modifiable wide optical band gap, and good adhesion on transparent substrate, suggest potential applications for ultraviolet photo-electronics.

  5. Oxygen-dependent phosphorus networking in ZnO thin films grown by low temperature rf sputtering

    NASA Astrophysics Data System (ADS)

    Pugel, D. Elizabeth; Vispute, R. D.; Hullavarad, S. S.; Venkatesan, T.; Varughese, B.

    2007-03-01

    Radio frequency (rf) sputtered films of 10at.% P2O5-doped zinc oxide (ZnO) were deposited at temperatures (Td) below the sublimation point of P2O5 (Td<350°C) and at a range of oxygen pressures p(O2). Ultraviolet-visible optical transmission measurements, x-ray photoelectron spectroscopy (XPS), and x-ray diffraction were used to examine the effects of p(O2) during deposition on the band gap and on the bonding behavior of phosphorus. At both deposition temperatures studied (room temperature with unintentional heating and 125°C), an increase in phosphorus concentration with increasing p(O2) was observed. However, the dependence of the band gap behavior on p(O2) was observed to be dramatically different for the two deposition temperatures: room-temperature-deposited films show a redshift while films deposited at 125°C show a blueshift. Analysis of the oxygen 1s XPS peak shows a progressive formation of nonbridging (Zn-O-P) bond networks for room temperature films, whereas films grown at 125°C show increased (P-O-P) bond networks with increasing p(O2). This indicates that a small degree of thermal activation considerably modifies the bonding behavior of phosphorus in ZnO. Implications of these results for the use of phosphorus as a p-type dopant for ZnO are discussed.

  6. Electrical surface-resistivity, dielectric resonance, polarization and magnetic properties of Bi0.5Sr0.5FeO3-δ thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Balamurugan, K.; Ramachandran, B.; Krishna Surendra, M.; Kumar, N. Harish; Ramachandra Rao, M. S.; Santhosh, P. N.

    2014-09-01

    Polycrystalline and highly preferred (1\\,0\\,\\bar{{2}}) orientated Bi0.5Sr0.5FeO3-δ thin films were grown by pulsed laser deposition (PLD) on n-Si (2 0 0) and MgO (2 0 0) single crystalline substrates respectively. The thin films were inspected using x-ray diffraction, scanning electron microscopy, energy dispersive x-ray spectroscopy and atomic force microscopy techniques. The electrical surface-resistivity, dielectric resonance, electric polarization, and magnetic properties of the thin films were studied. At room temperature, depending on deposition conditions, the polycrystalline thin films grown on n-Si substrates were found to exhibit an electrical surface-resistivity of the order of 103-106 Ω, a piezoelectric resonance in the frequency range of about 25-26 MHz, a relaxor-type ferroelectric hysteresis with a maximum polarization of 0.015-0.055 µC cm-2 and magnetic hysteresis. Similarly, the thin films grown on MgO substrates exhibited an electrical surface-resistivity of the order of 109 Ω, multiple piezoelectric resonances in the frequency range of about 8-45 MHz, a linear variation of polarization with applied electric field and either a linearly varying magnetization or magnetic hysteresis which depends on the deposition conditions.

  7. The effects of oxygen pressure on disordering and magneto-transport properties of Ba{sub 2}FeMoO{sub 6} thin films grown via pulsed laser deposition

    SciTech Connect

    Kim, Kyeong-Won; Mhin, Sungwook; Jones, Jacob L.; Norton, David P.; Ghosh, Siddhartha Buvaev, Sanal; Hebard, Arthur F.

    2015-07-21

    Epitaxial Ba{sub 2}FeMoO{sub 6} thin films were grown via pulsed laser deposition under low oxygen pressure and their structural, chemical, and magnetic properties were examined, focusing on the effects of oxygen pressure. The chemical disorder, off-stoichiometry in B site cations (Fe and Mo) increased with increasing oxygen pressure and thus magnetic properties were degraded. Interestingly, in contrast, negative magneto-resistance, which is the characteristics of this double perovskite material, was enhanced with increasing oxygen pressure. It is believed that phase segregation of highly disordered thin films is responsible for the increased magneto-resistance of thin films grown at high oxygen pressure. The anomalous Hall effect, which behaves hole-like, was also observed due to spin-polarized itinerant electrons under low magnetic field below 1 T and the ordinary electron-like Hall effect was dominant at higher magnetic fields.

  8. Investigation of NbNx thin films and nanoparticles grown by pulsed laser deposition and thermal diffusion

    NASA Astrophysics Data System (ADS)

    Hassan Farha, Ashraf

    Niobium nitride films (NbNx) were grown on Nb and Si (100) substrates using pulsed laser deposition (PLD), laser heating, and thermal diffusion methods. Niobium nitride films were deposited on Nb substrates using PLD with a Q-switched Nd: YAG laser (lambda = 1064 nm, 40 ns pulse width, and 10 Hz repetition rate) at different laser fluences, different nitrogen background pressures and deposition temperatures. The effect of changing PLD parameters for films done by PLD was studied. The seen observations establish guidelines for adjusting the laser parameters to achieve the desired morphology and phase of the grown NbNx films. When the fabrication parameters are fixed, except for laser fluence, surface roughness, deposition rate, nitrogen content, and grain size increases with increasing laser fluence. Increasing nitrogen background pressure leads to change in the phase structure of the NbNx films from mixed -Nb 2N and cubic delta-NbN phases to single hexagonal beta- Nb 2N. A change in substrate temperature led to a pronounced change in the preferred orientation of the crystal structure, the phase transformation, surface roughness, and composition of the films. The structural, electronic, and nanomechanical properties of niobium nitride PLD deposited at different nitrogen pressures (26.7-66.7 Pa) on Si(100) were investigated. The NbNx, films exhibited a cubic delta-NbN with a strong (111) orientation. A correlation between surface morphology, electronic, and superconducting properties was found. The highly-textured delta-NbN films have a Tc up to 15.07 K. The film was deposited at a nitrogen background pressure of 66.7 Pa exhibited improved superconducting properties and showed higher hardness values as compared to films deposited at lower nitrogen pressures. NbN nanoclusters that were deposited on carbon coated Cu-grids using PLD at laser fluence of 8 J/cm2 were observed. Niobium nitride is prepared by heating of Nb sample in a reactive nitrogen atmosphere (133 Pa

  9. Polycrystalline domain structure of pentacene thin films epitaxially grown on a hydrogen-terminated Si(111) surface

    SciTech Connect

    Nishikata, S.; Sadowski, J. T.; Al-Mahboob, A.; Nishihara, T.; Fujikawa, Y.; Sakurai, T.; Nakajima, K.; Sazaki, G.; Suto, S.

    2007-10-15

    Single-monolayer high pentacene (Pn) dendrites grown on a hydrogen-terminated Si(111) surface [H-Si(111)] under ultrahigh vacuum were observed by low-energy electron microscopy and microbeam low-energy electron diffraction analyses. We determined the epitaxial structure (type I) inside a unique polycrystalline domain structure of such dendrites, each of which has six equivalent epitaxial orientations of Pn two-dimensional (2D) unit cells. There are three sets of these cells, which are rotated {+-}120 deg. relative to each other. Domain boundaries inside each dendrite were successfully observed by scanning tunneling microscopy. In addition, we found another epitaxial relation (type II): the polycrystalline domain structure and lattice parameters are similar to those of the type-I dendrite; however, the 2D unit cells of the type-II dendrite are rotated approximately 90 deg. relative to those of the type-I dendrite. These results suggest that the crystal structure of the dendrites on H-Si(111) is determined mainly by the interaction between Pn molecules. Each dendrite is composed of domains that are exclusively of type I or II. The so-called point-on-line coincidences are found between the Pn 2D lattices of types I and II, and H-Si(111). The higher commensurability of the type-I dendrites than the type-II dendrites results in a higher probability of type-I dendrite formation. Moreover, for both the type-I and type-II dendrites, we found supercell structures. We estimated the minimum interface energy between the dendrite and H-Si(111) from an island's free energy, which is necessary to reproduce the growth of a single-monolayer high dendrite.

  10. Electrical resistivity of CuAlMo thin films grown at room temperature by dc magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Birkett, Martin; Penlington, Roger

    2016-07-01

    We report on the thickness dependence of electrical resistivity of CuAlMo films grown by dc magnetron sputtering on glass substrates at room temperature. The electrical resistance of the films was monitored in situ during their growth in the thickness range 10–1000 nm. By theoretically modelling the evolution of resistivity during growth we were able to gain an insight into the dominant electrical conduction mechanisms with increasing film thickness. For thicknesses in the range 10–25 nm the electrical resistivity is found to be a function of the film surface roughness and is well described by Namba’s model. For thicknesses of 25–40 nm the experimental data was most accurately fitted using the Mayadas and Shatkes model which accounts for grain boundary scattering of the conduction electrons. Beyond 40 nm, the thickness of the film was found to be the controlling factor and the Fuchs–Sonheimer (FS) model was used to fit the experimental data, with diffuse scattering of the conduction electrons at the two film surfaces. By combining the Fuchs and Namba (FN) models a suitable correlation between theoretical and experimental resistivity can be achieved across the full CuAlMo film thickness range of 10–1000 nm. The irreversibility of resistance for films of thickness >200 nm, which demonstrated bulk conductivity, was measured to be less than 0.03% following subjection to temperature cycles of ‑55 and +125 °C and the temperature co-efficient of resistance was less than ±15 ppm °C‑1.

  11. Potentiometric Zinc Ion Sensor Based on Honeycomb-Like NiO Nanostructures

    PubMed Central

    Abbasi, Mazhar Ali; Ibupoto, Zafar Hussain; Hussain, Mushtaque; Khan, Yaqoob; Khan, Azam; Nur, Omer; Willander, Magnus

    2012-01-01

    In this study honeycomb-like NiO nanostructures were grown on nickel foam by a simple hydrothermal growth method. The NiO nanostructures were characterized by field emission electron microscopy (FESEM), high resolution transmission electron microscopy (HRTEM) and X-ray diffraction (XRD) techniques. The characterized NiO nanostructures were uniform, dense and polycrystalline in the crystal phase. In addition to this, the NiO nanostructures were used in the development of a zinc ion sensor electrode by functionalization with the highly selective zinc ion ionophore 12-crown-4. The developed zinc ion sensor electrode has shown a good linear potentiometric response for a wide range of zinc ion concentrations, ranging from 0.001 mM to 100 mM, with sensitivity of 36 mV/decade. The detection limit of the present zinc ion sensor was found to be 0.0005 mM and it also displays a fast response time of less than 10 s. The proposed zinc ion sensor electrode has also shown good reproducibility, repeatability, storage stability and selectivity. The zinc ion sensor based on the functionalized NiO nanostructures was also used as indicator electrode in potentiometric titrations and it has demonstrated an acceptable stoichiometric relationship for the determination of zinc ion in unknown samples. The NiO nanostructures-based zinc ion sensor has potential for analysing zinc ion in various industrial, clinical and other real samples. PMID:23202217

  12. Potentiometric zinc ion sensor based on honeycomb-like NiO nanostructures.

    PubMed

    Abbasi, Mazhar Ali; Ibupoto, Zafar Hussain; Hussain, Mushtaque; Khan, Yaqoob; Khan, Azam; Nur, Omer; Willander, Magnus

    2012-01-01

    In this study honeycomb-like NiO nanostructures were grown on nickel foam by a simple hydrothermal growth method. The NiO nanostructures were characterized by field emission electron microscopy (FESEM), high resolution transmission electron microscopy (HRTEM) and X-ray diffraction (XRD) techniques. The characterized NiO nanostructures were uniform, dense and polycrystalline in the crystal phase. In addition to this, the NiO nanostructures were used in the development of a zinc ion sensor electrode by functionalization with the highly selective zinc ion ionophore 12-crown-4. The developed zinc ion sensor electrode has shown a good linear potentiometric response for a wide range of zinc ion concentrations, ranging from 0.001 mM to 100 mM, with sensitivity of 36 mV/decade. The detection limit of the present zinc ion sensor was found to be 0.0005 mM and it also displays a fast response time of less than 10 s. The proposed zinc ion sensor electrode has also shown good reproducibility, repeatability, storage stability and selectivity. The zinc ion sensor based on the functionalized NiO nanostructures was also used as indicator electrode in potentiometric titrations and it has demonstrated an acceptable stoichiometric relationship for the determination of zinc ion in unknown samples. The NiO nanostructures-based zinc ion sensor has potential for analysing zinc ion in various industrial, clinical and other real samples. PMID:23202217

  13. Atomic disorder of Li0.5Ni0.5O thin films caused by Li doping: estimation from X-ray Debye–Waller factors

    PubMed Central

    Yang, Anli; Sakata, Osami; Yamauchi, Ryosuke; Kumara, L. S. R.; Song, Chulho; Katsuya, Yoshio; Matsuda, Akifumi; Yoshimoto, Mamoru

    2015-01-01

    Cubic type room-temperature (RT) epitaxial Li0.5Ni0.5O and NiO thin films with [111] orientation grown on ultra-smooth sapphire (0001) substrates were examined using synchrotron-based thin-film X-ray diffraction. The 11 and 22 rocking curves including six respective equivalent reflections of the Li0.5Ni0.5O and NiO thin films were recorded. The RT B 1 factor, which appears in the Debye–Waller factor, of a cubic Li0.5Ni0.5O thin film was estimated to be 1.8 (4) Å2 from its 11 and 22 reflections, even though the Debye model was originally derived on the basis of one cubic element. The corresponding Debye temperature is 281 (39) K. Furthermore, the B 2 factor in the pseudo-Debye–Waller factor is proposed. This parameter, which is evaluated using one reflection, was also determined for the Li0.5Ni0.5O thin film by treating Li0.5Ni0.5O and NiO as ideal NaCl crystal structures. A structural parameter for the atomic disorder is introduced and evaluated. This parameter includes the combined effects of thermal vibration, interstitial atoms and defects caused by Li doping using the two Debye–Waller factors. PMID:26664345

  14. In situ fabrication of electrochemically grown mesoporous metallic thin films by anodic dissolution in deep eutectic solvents.

    PubMed

    Renjith, Anu; Roy, Arun; Lakshminarayanan, V

    2014-07-15

    We describe here a simple electrodeposition process of forming thin films of noble metallic nanoparticles such as Au, Ag and Pd in deep eutectic solvents (DES). The method consists of anodic dissolution of the corresponding metal in DES followed by the deposition on the cathodic surface. The anodic dissolution process in DES overcomes the problems associated with copious hydrogen and oxygen evolution on the electrode surface when carried out in aqueous medium. The proposed method utilizes the inherent abilities of DES to act as a reducing medium while simultaneously stabilizing the nanoparticles that are formed. The mesoporous metal films were characterized by SEM, XRD and electrochemical techniques. Potential applications of these substrates in surface enhanced Raman spectroscopy and electrocatalysis have been investigated. A large enhancement of Raman signal of analyte was achieved on the mesoporous silver substrate after removing all the stabilizer molecules from the surface by calcination. The highly porous texture of the electrodeposited film provides superior electro catalytic performance for hydrogen evolution reaction (HER). The mechanisms of HER on the fabricated substrates were studied by Tafel analysis and electrochemical impedance spectroscopy (EIS). PMID:24863793

  15. Yb:YAG thin disk laser passively Q-switched by a hydro-thermal grown molybdenum disulfide saturable absorber

    NASA Astrophysics Data System (ADS)

    Zhan, Yi; Wang, Li; Wang, Jie Yu; Li, Hong Wei; Yu, Zhen Huang

    2015-02-01

    We demonstrate a passively Q-switched Yb:YAG thin disk solid-state laser based on nanoflake MoS2 as a saturable absorber. MoS2 is synthesized by a hydro-thermal process. The prepared MoS2 is transferred onto the BK7 glass for ease-of-use in the solid-state laser as a saturable absorber. The average output power could reach up to 250 mW, center wavelength 1030 nm corresponding to a pulse width, a pulse repetition rate, and a per pulse energy of 12 μs, 17 kHz, and 15 μJ, respectively. Our results show that nanoflake MoS2 could be a promising saturable absorber for Q-switching solid-state lasers. The over saturation of the MoS2 saturable absorber at a high pump strength limit in a solid-state laser could be also effective for high power operation.

  16. Co2FeAl thin films grown on MgO substrates: Correlation between static, dynamic, and structural properties

    NASA Astrophysics Data System (ADS)

    Belmeguenai, M.; Tuzcuoglu, H.; Gabor, M. S.; Petrisor, T., Jr.; Tiusan, C.; Berling, D.; Zighem, F.; Chauveau, T.; Chérif, S. M.; Moch, P.

    2013-05-01

    Co2FeAl (CFA) thin films with thickness varying from 10 to 115 nm have been deposited on MgO(001) substrates by magnetron sputtering and then capped by a Ta or Cr layer. X-ray diffraction (XRD) revealed that the cubic [001] CFA axis is normal to the substrate and that all the CFA films exhibit full epitaxial growth. The chemical order varies from the B2 phase to the A2 phase when decreasing the thickness. Magneto-optical Kerr effect (MOKE) and vibrating sample magnetometer (VSM) measurements show that, depending on the field orientation, one- or two-step switchings occur. Moreover, the films present a quadratic MOKE signal increasing with the CFA thickness, due to the increasing chemical order. Ferromagnetic resonance (FMR), MOKE transverse bias initial inverse susceptibility and torque (TBIIST) measurements reveal that the in-plane anisotropy results from the superposition of a uniaxial and of a fourfold symmetry term. The fourfold anisotropy is in accord with the crystal structure of the samples and is correlated to the biaxial strain and to the chemical order present in the films. In addition, a large negative perpendicular uniaxial anisotropy is observed. Frequency and angular dependencies of the ferromagnetic resonance linewidth show two magnon scattering and mosaicity contributions, which depend on the CFA thickness. A Gilbert damping coefficient as low as 0.0011 is found.

  17. Effect of sulfurization time on the properties of copper zinc tin sulfide thin films grown by electrochemical deposition

    PubMed Central

    Aldalbahi, Ali; Mkawi, E. M.; Ibrahim, K.; Farrukh, M. A.

    2016-01-01

    We report growth of quaternary Cu2 ZnSnS4 (CZTS) thin films prepared by the electrochemical deposition from salt precursors containing Cu (II), Zn (II) and Sn (IV) metals. The influence of different sulfurization times t (t = 75, 90, 105, and 120 min) on the structural, compositional, morphological, and optical properties, as well as on the electrical properties is studied. The films sulfurized 2 hours showed a prominent kesterite phase with a nearly stoichiometric composition. Samples were characterized by X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM), and Raman and UV-VIS-NIR spectrometer at different stages of work. X-ray diffraction and Raman spectroscopy analyses confirmed the formation of phase-pure CZTS films. (FESEM) shows that compact and dense morphology and enhanced photo-sensitivity. STEM - EDS elemental map of CZTS cross-section confirms homogeneous distribution. From optical study, energy gap was enlarged with a changed sulfurization times in the range of 1.37–1.47 eV. PMID:27600023

  18. Effect of sulfurization time on the properties of copper zinc tin sulfide thin films grown by electrochemical deposition.

    PubMed

    Aldalbahi, Ali; Mkawi, E M; Ibrahim, K; Farrukh, M A

    2016-01-01

    We report growth of quaternary Cu2 ZnSnS4 (CZTS) thin films prepared by the electrochemical deposition from salt precursors containing Cu (II), Zn (II) and Sn (IV) metals. The influence of different sulfurization times t (t = 75, 90, 105, and 120 min) on the structural, compositional, morphological, and optical properties, as well as on the electrical properties is studied. The films sulfurized 2 hours showed a prominent kesterite phase with a nearly stoichiometric composition. Samples were characterized by X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM), and Raman and UV-VIS-NIR spectrometer at different stages of work. X-ray diffraction and Raman spectroscopy analyses confirmed the formation of phase-pure CZTS films. (FESEM) shows that compact and dense morphology and enhanced photo-sensitivity. STEM - EDS elemental map of CZTS cross-section confirms homogeneous distribution. From optical study, energy gap was enlarged with a changed sulfurization times in the range of 1.37-1.47 eV. PMID:27600023

  19. Structure and composition of zirconium carbide thin-film grown by ion beam sputtering for optical applications

    SciTech Connect

    Singh, Amol Modi, Mohammed H. Dhawan, Rajnish Lodha, G. S.

    2014-04-24

    Thin film of compound material ZrC was deposited on Si (100) wafer using ion beam sputtering method. The deposition was carried out at room temperature and at base pressure of 3×10{sup −5} Pa. X-ray photoelectron spectroscopy (XPS) measurements were performed for determining the surface chemical compositions. Grazing incidence x-ray reflectivity (GIXRR) measurements were performed to study the film thickness, roughness and density. From GIXRR curve roughness value of the film was found less than 1 nm indicating smooth surface morphology. Films density was found 6.51 g/cm{sup 3}, which is close to bulk density. Atomic force microscopy (AFM) measurements were performed to check the surface morphology. AFM investigation showed that the film surface is smooth, which corroborate the GIXRR data. Figure 2 of the original article PDF file, as supplied to AIP Publishing, contained a PDF processing error. This article was updated on 12 May 2014 to correct that error.

  20. Ultra-high mobility transparent organic thin film transistors grown by an off-centre spin-coating method

    NASA Astrophysics Data System (ADS)

    Yuan, Yongbo; Giri, Gaurav; Ayzner, Alexander L.; Zoombelt, Arjan P.; Mannsfeld, Stefan C. B.; Chen, Jihua; Nordlund, Dennis; Toney, Michael F.; Huang, Jinsong; Bao, Zhenan

    2014-01-01

    Organic semiconductors with higher carrier mobility and better transparency have been actively pursued for numerous applications, such as flat-panel display backplane and sensor arrays. The carrier mobility is an important figure of merit and is sensitively influenced by the crystallinity and the molecular arrangement in a crystal lattice. Here we describe the growth of a highly aligned meta-stable structure of 2,7-dioctyl[1]benzothieno[3,2-b][1]benzothiophene (C8-BTBT) from a blended solution of C8-BTBT and polystyrene by using a novel off-centre spin-coating method. Combined with a vertical phase separation of the blend, the highly aligned, meta-stable C8-BTBT films provide a significantly increased thin film transistor hole mobility up to 43 cm2 Vs-1 (25 cm2 Vs-1 on average), which is the highest value reported to date for all organic molecules. The resulting transistors show high transparency of >90% over the visible spectrum, indicating their potential for transparent, high-performance organic electronics.

  1. Role of the substrate on the magnetic anisotropy of magnetite thin films grown by ion-assisted deposition

    NASA Astrophysics Data System (ADS)

    Prieto, Pilar; Prieto, José Emilio; Gargallo-Caballero, Raquel; Marco, José Francisco; de la Figuera, Juan

    2015-12-01

    Magnetite (Fe3O4) thin films were deposited on MgO (0 0 1), SrTiO3 (0 0 1), LaAlO3 (0 0 1) single crystal substrates as well on as silicon and amorphous glass in order to study the effect of the substrate on their magnetic properties, mainly the magnetic anisotropy. We have performed a structural, morphological and compositional characterization by X-ray diffraction, atomic force microscopy and Rutherford backscattering ion channeling in oxygen resonance mode. The magnetic anisotropy has been investigated by vectorial magneto-optical Kerr effect. The results indicate that the magnetic anisotropy is especially influenced by the substrate-induced microstructure. In-plane isotropy and uniaxial anisotropy behavior have been observed on silicon and glass substrates, respectively. The transition between both behaviors depends on grain size. For LaAlO3 substrates, in which the lattice mismatch between the Fe3O4 films and the substrate is significant, a weak in-plane fourfold magnetic anisotropy is induced. However when magnetite is deposited on MgO (0 0 1) and SrTiO3 (0 0 1) substrates, a well-defined fourfold in-plane magnetic anisotropy is observed with easy axes along [1 0 0] and [0 1 0] directions. The magnetic properties on these two latter substrates are similar in terms of magnetic anisotropy and coercive fields.

  2. Role of surface-electrical properties on the cell-viability of carbon thin films grown in nanodomain morphology

    NASA Astrophysics Data System (ADS)

    Javid, Amjed; Kumar, Manish; Yoon, Seokyoung; Lee, Jung Heon; Tajima, Satomi; Hori, Masaru; Geon Han, Jeon

    2016-07-01

    Carbon thin films, having a combination of unique physical and chemical properties, exhibit an interesting biocompatibility and biological response to living entities. Here, the carbon films are developed in the morphology form of nano-domains with nanoscale inter-domain separations, tuned by plasma conditions in the facing target magnetron sputtering process. The wettability and surface energy are found to have a close relation to the inter-domain separations. The chemical structure of carbon films exhibited the relative enhancement of sp3 in comparison to sp2 with the increase of domain separations. The cell-viability of these films shows promising results for L929 mouse fibroblast and Saos-2 bone cells, when inter-domain separation is increased. Electrical conductivity and surface energy are identified to play the key role in different time-scales during the cell-proliferation process. The contribution from electrical conductivity is dominant in the beginning of the cultivation, whereas with the passage of time (~3–5 d) the surface energy takes control over conductivity to enhance the cell proliferation.

  3. Luminescent characteristics of Se-doped ZnGa2O4:Mn thin film phosphors grown by pulsed laser ablation

    NASA Astrophysics Data System (ADS)

    Jeong, J. H.; Bae, J. S.; Choi, B. C.; Yi, S. S.; Holloway, P. H.

    2004-07-01

    Mn-doped ZnGa2O4-xSex (x=0.00, 0.025, 0.05, 0.075 and 0.10) thin film phosphors have been grown using pulsed laser ablation under various growth conditions. Structural characterization was carried out on a series of ZnGa2O4-xSex:Mn2+ films grown on MgO(100) substrates using Zn-rich ceramic targets. Zn-rich ceramic targets were prepared to compensate for loss of vaporization of Zn during deposition. The oxygen pressure was fixed at 100 mTorr and the substrate temperatures were varied from 500 to 700 °C. Luminescence results indicated that MgO (100) is a promising substrate for the growth of high-quality of ZnGa2O4-xSex:Mn2+ films. The crystallinity and surface roughness of the ZnGa2O4-xSex:Mn2+ films are highly dependent on the growth conditions, in particular on the substrate temperature and composition ratio of targets. The crystallinity of the films improved with Se doping. Incorporation of Se into the ZnGa2O4 lattice led to a remarkable increase of photoluminescence. The highest green emission intensity was observed with ZnGa2O3.925Se0.075:Mn2+ films whose brightness was increased by a factor of 3.1 in comparison with that of ZnGa2O4:Mn2+ films. This phosphor is promising for application in flat panel displays. .

  4. Phase diagram of LaVO3 under epitaxial strain: Implications for thin films grown on SrTiO3 and LaAlO3 substrates

    NASA Astrophysics Data System (ADS)

    Weng, Hongming; Terakura, Kiyoyuki

    2010-09-01

    Various exotic phenomena have been observed in epitaxially grown films and superlattices of transition-metal oxides. In these systems, not only the interface properties but also the strain-induced modification in the bulk properties play important roles. With the recent experimental activities [Y. Hotta, T. Susaki, and H. Y. Hwang, Phys. Rev. Lett. 99, 236805 (2007)10.1103/PhysRevLett.99.236805] in mind, we have studied the epitaxial strain effects on the electronic structure of Mott insulator LaVO3 . The present work is based on the calculations using density-functional theory supplemented by adding local Coulomb repulsion U for Vd orbitals. The range of strain studied here extends from c/a=0.98 (bulk LaVO3 case) to c/a=1.107 ( LaAlO3 substrate case). In this range of the strain, we have found the following three different antiferromagnetic spin-ordering (SO) phases. For 0.98grown on SrTiO3 is in this range. When c/a>1.095 , G -type SO with ferromagnetic OO becomes the ground state. This range includes the case of LaAlO3 substrate. The implications of these results with regard to the experimental data for thin films of LaVO3 on SrTiO3 and LaAlO3 substrates will be described. Detailed discussion is given on the mechanisms of stabilizing particular combination of SO and OO in each of three phases.

  5. Spectroscopic and microscopic studies of self-assembled nc-Si/a-SiC thin films grown by low pressure high density spontaneous plasma processing.

    PubMed

    Das, Debajyoti; Kar, Debjit

    2014-12-14

    In view of suitable applications in the window layer of nc-Si p-i-n solar cells in superstrate configuration, the growth of nc-Si/a-SiC composite films was studied, considering the trade-off relation between individual characteristics of its a-SiC component to provide a wide optical-gap and electrically conducting nc-Si component to simultaneously retain enough crystalline linkages to facilitate proper crystallization to the i-nc-Si absorber-layer during its subsequent growth. Self-assembled nc-Si/a-SiC thin films were spontaneously grown by low-pressure planar inductively coupled plasma CVD, operating in electromagnetic mode, providing high atomic-H density. Spectroscopic simulations of ellipsometry and Raman data, and systematic chemical and structural analysis by XPS, TEM, SEM and AFM were performed. Corresponding to optimized inclusion of C essentially incorporated as Si-C bonds in the network, the optical-gap of the a-SiC component widened, void fraction including the incubation layer thickness reduced. While the bulk crystallinity decreased only marginally, Si-ncs diminished in size with narrower distribution and increased number density. With enhanced C-incorporation, formation of C-C bonds in abundance deteriorates the Si continuous bonding network and persuades growth of an amorphous dominated silicon-carbon heterostructure containing high-density tiny Si-ncs. Stimulated nanocrystallization identified in the Si-network, induced by a limited amount of carbon incorporation, makes the material most suitable for applications in nc-Si solar cells. The novelty of the present work is to enable spontaneous growth of self-assembled superior quality nc-Si/a-SiC thin films and simultaneous spectroscopic simulation-based optimization of properties for utilization in devices. PMID:25342429

  6. Effect of substrate temperature on the optical, structural and morphological properties of In2Se3 thin films grown by a two-step process

    NASA Astrophysics Data System (ADS)

    Clavijo, J.; Romero, E.; Gordillo, G.

    2009-05-01

    Polycrystalline γ - In2Se3 thin films with adequate properties to use them as buffer layer in solar cells, were grown on corning glass substrates using a novel procedure which includes the formation of the α- In2Se3 phase in a first step followed by thermal annealing in Se ambient to activate the formation of the γ- In2Se3 phase. X-ray diffraction (XRD) measurements revealed that the substrate temperature strongly affects the phase in which the indium selenide films grow; at substrate temperatures of around 300°C the indium selenide grow in the α-In2Se3 phase, whereas the samples deposited at temperatures between 300 and 550°C grow with a mixture of the α-In2Se3 and γ-In2Se3 phases. The α-In2Se3 samples change into the γ-In2Se3 phase when subjected to heat treatment around 550°C in Se ambient. Spectrophotometric measurements also revealed that the phase in which the indium selenide films grow, significantly affects the optical gap Eg. Eg values of 1.47 eV and 2.11 eV were determined for the α-In2Se3 and γ-In2Se3 films respectively, indicating that this γ-In2Se3 compound has better properties to perform as buffer layer in thin film solar cells. The effect of substrate temperature on the structural, optical and morphological properties was investigated using XRD, spectral transmittance and atomic force microscope (AFM) measurements. Theoretical simulation of the XRD pattern carried out with the help of the PowderCell package, allowed us to identify the phases associated to the X-Ray reflections, with a good degree of confidence.

  7. Precise calibration of Mg concentration in Mg{sub x}Zn{sub 1-x}O thin films grown on ZnO substrates

    SciTech Connect

    Kozuka, Y.; Falson, J.; Tsukazaki, A.; Segawa, Y.; Makino, T.; Kawasaki, M.

    2012-08-15

    The growth techniques for Mg{sub x}Zn{sub 1-x}O thin films have advanced at a rapid pace in recent years, enabling the application of this material to a wide range of optical and electrical applications. In designing structures and optimizing device performances, it is crucial that the Mg content of the alloy be controllable and precisely determined. In this study, we have established laboratory-based methods to determine the Mg content of Mg{sub x}Zn{sub 1-x}O thin films grown on ZnO substrates, ranging from the solubility limit of x {approx} 0.4 to the dilute limit of x < 0.01. For the absolute determination of Mg content, Rutherford backscattering spectroscopy is used for the high Mg region above x = 0.14, while secondary ion mass spectroscopy is employed to quantify low Mg content. As a lab-based method to determine the Mg content, c-axis length is measured by x-ray diffraction and is well associated with Mg content. The interpolation enables the determination of Mg content to x = 0.023, where the peak from the ZnO substrate overlaps the Mg{sub x}Zn{sub 1-x}O peak in standard laboratory equipment, and thus limits quantitative determination. At dilute Mg contents below x = 0.023, the localized exciton peak energy of the Mg{sub x}Zn{sub 1-x}O films as measured by photoluminescence is found to show a linear Mg content dependence, which is well resolved from the free exciton peak of ZnO substrate down to x = 0.0043. Our results demonstrate that x-ray diffraction and photoluminescence in combination are appropriate methods to determine Mg content in a wide Mg range from x = 0.004 to 0.40 in a laboratory environment.

  8. Development of an IR-transparent, inverted-grown, thin-film, Al[sub 0. 34]Ga[sub 0. 66]As/GaAs cascade solar cell

    SciTech Connect

    Venkatasubramanian, R.; Timmons, M.L.; Sharps, P.R.; Colpitts, T.S.; Hills, J.S.; Hancock, J.; Hutchby, J.A. )

    1992-12-01

    Inverted growth and the development of associated cell processing, are likely to offer a significant degree of freedom for improving the performance of many III-V multijunction cascades and open new avenues for advanced multijunction concepts. This is especially true for the development of high-efficiency Al[sub 0.37]Ga[sub 0.63]As/GaAs cascades where the high growth temperatures required for the AlGaAs top cell growth can cause the deterioration of the tunnel junction interconnect. In the approach of inverted-grown AlGaAs/GaAs cascade cells, the AlGaAs top cell is grown first at 780 [degree]C and the GaAs tunnel junction and bottom cell are grown at 675 [degree]C. After the inverted growth, the AlGaAs/GaAs cascade structure is selectively removed from the parent substrate. The feasibility of inverted growth is demonstrated by a fully-processed, inverted-grown, thin film GaAs cell with a 1-sun AM1.5 efficiency of 20.3%. Also, an inverted-grown, thin-film, Al[sub 0.34]Ga[sub 0.66]As/GaAs cascade with AM1.5 efficiencies of 19.9% and 21% at 1-sun and 7-suns, respectively, has been obtained.

  9. Microstructure and dielectric properties of (Ba 0.6Sr 0.4)TiO 3 thin films grown on super smooth glazed-Al 2O 3 ceramics substrate

    NASA Astrophysics Data System (ADS)

    Chen, Hongwei; Yang, Chuanren; Zheng, Shanxue; Zhang, Jihua; Zhang, Qiaozhen; Lei, Guanhuan; Lou, Feizhi; Yang, Lijun

    2011-12-01

    Modified substrates with nanometer scale smooth surface were obtained via coating a layer of CaO-Al2O3-SiO2 (CaAlSi) high temperature glaze with proper additives on the rough-95% Al2O3 ceramics substrates. (Ba0.6Sr0.4)TiO3 (BST) thin films were deposited on modified Al2O3 substrates by radio-frequency magnetron sputtering. The microstructure, dielectric, and insulating properties of BST thin films grown on glazed-Al2O3 substrates were investigated by X-ray diffraction (XRD), atomic force microscope (AFM), and dielectric properties measurement. These results showed that microstructure and dielectric properties of BST thin films grown on glazed-Al2O3 substrates were almost consistent with that of BST thin films grown on LaAlO3 (1 0 0) single-crystal substrates. Thus, the expensive single-crystal substrates may be substituted by extremely cheap glazed-Al2O3 substrates.

  10. Pressure effect on the magnetization of Sr{sub 2}FeMoO{sub 6} thin films grown by pulsed laser deposition

    SciTech Connect

    Fix, T.; Versini, G.; Loison, J.L.; Colis, S.; Schmerber, G.; Pourroy, G.; Dinia, A.

    2005-01-15

    Thin films of Sr{sub 2}FeMoO{sub 6} (SFMO) are grown on SrTiO{sub 3} (001) substrates by pulsed laser deposition. The best films provide 3.2{mu}{sub B}/f.u. at 5 K, a Curie temperature above 400 K, low roughness, high crystallinity, and low splashing. Therefore, the use of such SFMO electrodes in magnetic tunnel junctions patterned with conventional lithography is promising. Pseudomorphic epitaxial growth is obtained for thicknesses under 50 nm. Above this thickness the films do not relax homogeneously. A coherent and systematic variation of the magnetization with the deposition conditions is obtained, which highlights a high reproducibility. Under a reasonable O{sub 2} partial pressure to avoid parasite phases, the limiting factor for high magnetization is the total pressure or the deposition rate. Therefore, the deposition rate is suspected to have a strong influence on the Fe/Mo ordering. Highly magnetic samples are obtained under a low gas flow of either a 20% O{sub 2}+N{sub 2} or a 0.3% O{sub 2}+Ar.

  11. Structural properties of Bi{sub 2−x}Mn{sub x}Se{sub 3} thin films grown via molecular beam epitaxy

    SciTech Connect

    Babakiray, Sercan; Johnson, Trent A.; Borisov, Pavel; Holcomb, Mikel B.; Lederman, David; Marcus, Matthew A.; Tarafder, Kartick

    2015-07-28

    The effects of Mn doping on the structural properties of the topological insulator Bi{sub 2}Se{sub 3} in thin film form were studied in samples grown via molecular beam epitaxy. Extended x-ray absorption fine structure measurements, supported by density functional theory calculations, indicate that preferential incorporation occurs substitutionally in Bi sites across the entire film volume. This finding is consistent with x-ray diffraction measurements which show that the out of plane lattice constant expands while the in plane lattice constant contracts as the Mn concentration is increased. X-ray photoelectron spectroscopy indicates that the Mn valency is 2+ and that the Mn bonding is similar to that in MnSe. The expansion along the out of plane direction is most likely due to weakening of the Van der Waals interactions between adjacent Se planes. Transport measurements are consistent with this Mn{sup 2+} substitution of Bi sites if additional structural defects induced by this substitution are taken into account.

  12. Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Altuntas, Halit; Bayrak, Turkan; Kizir, Seda; Haider, Ali; Biyikli, Necmi

    2016-07-01

    In this study, aluminum nitride (AlN) thin films were deposited at 200 °C, on p-type silicon substrates utilizing a capacitively coupled hollow-cathode plasma source integrated atomic layer deposition (ALD) reactor. The structural properties of AlN were characterized by grazing incidence x-ray diffraction, by which we confirmed the hexagonal wurtzite single-phase crystalline structure. The films exhibited an optical band edge around ∼5.7 eV. The refractive index and extinction coefficient of the AlN films were measured via a spectroscopic ellipsometer. In addition, to investigate the electrical conduction mechanisms and dielectric properties, Al/AlN/p-Si metal-insulator-semiconductor capacitor structures were fabricated, and current density–voltage and frequency dependent (7 kHz–5 MHz) dielectric constant measurements (within the strong accumulation region) were performed. A peak of dielectric loss was observed at a frequency of 3 MHz and the Cole–Davidson empirical formula was used to determine the relaxation time. It was concluded that the native point defects such as nitrogen vacancies and DX centers formed with the involvement of Si atoms into the AlN layers might have influenced the electrical conduction and dielectric relaxation properties of the plasma-assisted ALD grown AlN films.

  13. Magnetic and transport properties of epitaxial thin film MgFe2O4 grown on MgO (100) by molecular beam epitaxy

    PubMed Central

    Wu, Han-Chun; Mauit, Ozhet; Coileáin, Cormac Ó; Syrlybekov, Askar; Khalid, Abbas; Mouti, Anas; Abid, Mourad; Zhang, Hong-Zhou; Abid, Mohamed; Shvets, Igor V.

    2014-01-01

    Magnesium ferrite is a very important magnetic material due to its interesting magnetic and electrical properties and its chemical and thermal stability. Here we report on the magnetic and transport properties of epitaxial MgFe2O4 thin films grown on MgO (001) by molecular beam epitaxy. The structural properties and chemical composition of the MgFe2O4 films were characterized by X-Ray diffraction and X-Ray photoelectron spectroscopy, respectively. The nonsaturation of the magnetization in high magnetic fields observed for M (H) measurements and the linear negative magnetoresistance (MR) curves indicate the presence of anti-phase boundaries (APBs) in MgFe2O4. The presence of APBs was confirmed by transmission electron microscopy. Moreover, post annealing decreases the resistance and enhances the MR of the film, suggesting migration of the APBs. Our results may be valuable for the application of MgFe2O4 in spintronics. PMID:25388355

  14. Observation of dopant-profile independent electron transport in sub-monolayer TiOx stacked ZnO thin films grown by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Saha, D.; Misra, P.; Das, Gangadhar; Joshi, M. P.; Kukreja, L. M.

    2016-01-01

    Dopant-profile independent electron transport has been observed through a combined study of temperature dependent electrical resistivity and magnetoresistance measurements on a series of Ti incorporated ZnO thin films with varying degree of static-disorder. These films were grown by atomic layer deposition through in-situ vertical stacking of multiple sub-monolayers of TiOx in ZnO. Upon decreasing ZnO spacer layer thickness, electron transport smoothly evolved from a good metallic to an incipient non-metallic regime due to the intricate interplay of screening of spatial potential fluctuations and strength of static-disorder in the films. Temperature dependent phase-coherence length as extracted from the magnetotransport measurement revealed insignificant role of inter sub-monolayer scattering as an additional channel for electron dephasing, indicating that films were homogeneously disordered three-dimensional electronic systems irrespective of their dopant-profiles. Results of this study are worthy enough for both fundamental physics perspective and efficient applications of multi-stacked ZnO/TiOx structures in the emerging field of transparent oxide electronics.

  15. LiNbO3 thin-film optical waveguide grown by liquid phase epitaxy and its application to second-harmonic generation

    NASA Astrophysics Data System (ADS)

    Tamada, Hitoshi; Yamada, Atsuo; Saitoh, Masaki

    1991-09-01

    LiNbO3 thin-film optical waveguides with high crystallinity and good surface morphology have been grown on 5 mol % MgO-doped Z-plate LiNbO3 substrates by liquid-phase epitaxy using Li2O-V2O5 flux. A small lattice mismatch less than 4×10-3 Å in the X axis, a small linewidth of 11s in an x-ray rocking curve, and a perfect mirror surface are realized by choosing a melt composition. Ordinary refractive index no at a wavelength of 0.6328 μm is unchanged (2.287) with melts of different compositions, but extraordinary refractive index ne can be changed from 2.205 to 2.192 or less by increasing Li2O in the melt with V2O5 fixed at 40 mol %. The optical absorption loss at a wavelength of 0.5145 μm caused by V incorporated from the flux is significantly reduced from 25 to 1.6 dB/cm by O3 annealing for 1 h at 600 °C. Efficient second-harmonic generation of TE0(1.064 μm) →TM0(0.532 μm) for a single-poled film is observed by a temperature-tuning method. The mechanism of self poling and domain inversion which were revealed by the present research is discussed.

  16. Wavelength tunable photoluminescence of ZnO{sub 1-x}S{sub x} alloy thin films grown by reactive sputtering

    SciTech Connect

    Xu, Hongbin; Zhu, Liping; Jiang, Jie; Cai, Hui; Chen, Wenfeng; Hu, Liang; Guo, Yanmin; Ye, Zhizhen

    2013-08-28

    ZnO{sub 1−x}S{sub x} alloy thin films with various S contents were deposited on glass substrates by reactive sputtering. The films were grown in high crystalline quality and strong preferential crystallographic orientation. Variations of the lattice constant c followed Vegard's law. X-ray photoelectron spectroscopy confirmed the substitution of O by S in ZnO. The composition dependence of the band gap energy in ZnO{sub 1−x}S{sub x} system was investigated and the band gap bowing parameter was estimated to be about 1.46 eV. The incorporation of S led to the expected redshift of the band gap related photoluminescence emission of ZnO{sub 1−x}S{sub x} films up to 320 meV. The results indicate that ZnO{sub 1−x}S{sub x} films could hold the prospect for the development of ZnO based quantum structures.

  17. Tin-Incorporation Induced Changes in the Microstructural, Optical, and Electrical Behavior of Tungsten Oxide Nanocrystalline Thin Films Grown Via Spray Pyrolysis

    NASA Astrophysics Data System (ADS)

    Mukherjee, Ramnayan; Prajapati, C. S.; Sahay, P. P.

    2014-12-01

    Undoped and Sn-doped WO3 thin films were grown on cleaned glass substrates by chemical spray pyrolysis, using ammonium tungstate (NH4)2WO4 as the host precursor and tin chloride (SnCl4·5H2O) as the source of dopant. The XRD spectra confirm the monoclinic structure with a sharp narrow peak along (200) direction along with other peaks of low relative intensities for all the samples. On Sn doping, the films exhibit reduced crystallinity relative to the undoped film. The standard deviation for relative peak intensity with dopant concentration shows enhancement in heterogeneous nucleation growth. As evident from SEM images, on Sn doping, appearance of island-like structure (i.e., cluster of primary crystallites at few places) takes place. The transmittance has been found to decrease in all the Sn-doped films. The optical band gap has been calculated for both direct and indirect transitions. On Sn doping, the direct band gap shows a red shift and becomes 2.89 eV at 2 at.% doping. Two distinct peaks, one blue emission at 408 nm and other green emission at 533 nm, have been found in the PL spectra. Electrical conductivity has been found to increase with Sn doping.

  18. Measuring relative performance of an EDS detector using a NiO standard.

    SciTech Connect

    Sugar, Joshua Daniel; Kotula, Paul Gabriel

    2013-09-01

    A method for measuring the relative performance of energy dispersive spectrometers (EDS) on a TEM is discussed. A NiO thin-film standard fabricated at Sandia CA is used. A performance parameter,, is measured and compared to values on several TEM systems.

  19. Structural, electrical, and optical properties of CoxNi1-xO films grown by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Roffi, Teuku Muhammad; Uchida, Kazuo; Nozaki, Shinji

    2015-03-01

    Thin films of cobalt-nickel oxide (CoxNi1-xO, x=0.01, 0.02, 0.08, 0.17, 0.22, 0.35, 0.56, 0.72) were grown on Al2O3 substrate by atmospheric pressure metalorganic chemical vapor deposition (APMOCVD). The effect of the cobalt composition on the structural, morphological, optical, and electrical properties of the films was investigated. X-ray diffraction (XRD) analysis revealed that all of the films grew with a preferred orientation towards [1 1 1]NiO and a twinned structure. Cobalt was well dispersed in the NiO structure up to x=0.08. CoxNi1-xO alloys were formed from x=0.17 to x=0.22, while phase-separated NiO and CoxNi1-xO formed when x≥0.35. The bandgap of the CoxNi1-xO film was found to decrease with increasing cobalt composition. Four-point probe measurements showed that the resistivity of the film also decreased with increasing cobalt composition, reaching a minimum of 0.006 Ωcm. Hall measurements of the films revealed n-type conductivity. The correlation between the presence of cobalt in different ionization states and the observed decrease in resistivity as well as the type of conductivity in CoxNi1-xO is discussed.

  20. NiO nanosheet/TiO2 nanorod-constructed p-n heterostructures for improved photocatalytic activity

    NASA Astrophysics Data System (ADS)

    Sun, Bin; Zhou, Guowei; Gao, Tingting; Zhang, Huaijin; Yu, Haohai

    2016-02-01

    NiO nanosheet/acid-corroded TiO2 nanorod (A-TiO2 nanorod) heterostructures with high photocatalytic activity were successfully fabricated via a facile and low-cost hydrothermal route. The as-prepared heterostructures featured NiO nanosheets with uniformly assembled A-TiO2 nanorods and a rough surface. The morphology, structure, and photoelectric properties of the pristine NiO nanosheets and TiO2-based nanomaterials were characterized in detail, and results revealed that secondary NiO nanosheets were successfully grown on TiO2 nanorod substrates to achieve a p-n heterostructure between the cubic structure NiO and the TiO2 anatase phase. In comparison with P25, NiO nanosheets, TiO2 nanorods, and A-TiO2 nanorods, the proposed heterostructures exhibited markedly enhanced photocatalytic activity for the degradation of methyl orange under UV light irradiation. Specifically, the NiO nanosheet/A-TiO2 nanorod heterostructures exhibited the best photocatalytic activity, achieving 100% photocatalytic efficiency within 20 min. The observed enhancement in photocatalytic activity was attributed to the synergetic contributions of p-n heterostructures and the large specific surface area of the catalyst, which may improve the separation of photogenerated electron-hole pairs and prolong the lifetime of charge carriers. The heterostructures could be easily recycled without observable decreases in photocatalytic activity because of their one-dimensional nanostructural property.

  1. Single-crystalline Ni(OH)2 and NiO nanoplatelet arrays as supercapacitor electrodes

    NASA Astrophysics Data System (ADS)

    Li, Jiangtian; Zhao, Wei; Huang, Fuqiang; Manivannan, Ayyakkannu; Wu, Nianqiang

    2011-12-01

    Vertically aligned Ni(OH)2 and NiO single-crystalline nanoplatelet arrays were directly grown on the fluorine-doped tin oxide (FTO) substrate by a simple hydrothermal method. The effects of the hydrothermal parameters on the morphology and crystal structure of the nanoarray film were investigated. Controlling the ammonia and persulfate concentrations was the key to controlling the morphology of the nanoarray film. The experimental results showed that the single-crystalline NiO nanoplatelet array was a promising candidate for the supercapacitor electrode. It exhibited a high specific capacitance, prompt charge/discharge rate, and good stability of cycling performance. It is believed that the vertically oriented aligned single-crystalline NiO nanoplatelet array is beneficial to the charge transfer in the electrode and to the ion transport in the solution during redox reaction.Vertically aligned Ni(OH)2 and NiO single-crystalline nanoplatelet arrays were directly grown on the fluorine-doped tin oxide (FTO) substrate by a simple hydrothermal method. The effects of the hydrothermal parameters on the morphology and crystal structure of the nanoarray film were investigated. Controlling the ammonia and persulfate concentrations was the key to controlling the morphology of the nanoarray film. The experimental results showed that the single-crystalline NiO nanoplatelet array was a promising candidate for the supercapacitor electrode. It exhibited a high specific capacitance, prompt charge/discharge rate, and good stability of cycling performance. It is believed that the vertically oriented aligned single-crystalline NiO nanoplatelet array is beneficial to the charge transfer in the electrode and to the ion transport in the solution during redox reaction. Electronic supplementary information (ESI) available: XRD patterns of Ni(OH)2 and NiO powders; SEM and TEM images of Ni(OH)2 and NiO nanoplatelet arrays; and electrochemical performances for NiO nanoarrays and powders. See

  2. Highly transparent and reproducible nanocrystalline ZnO and AZO thin films grown by room temperature pulsed-laser deposition on flexible Zeonor plastic substrates

    NASA Astrophysics Data System (ADS)

    Inguva, Saikumar; Vijayaraghavan, Rajani K.; McGlynn, Enda; Mosnier, Jean-Paul

    2015-09-01

    Zeonor plastics are highly versatile due to exceptional optical and mechanical properties which make them the choice material in many novel applications. For potential use in flexible transparent optoelectronic applications, we have investigated Zeonor plastics as flexible substrates for the deposition of highly transparent ZnO and AZO thin films. Films were prepared by pulsed laser deposition at room temperature in oxygen ambient pressures of 75, 150 and 300 mTorr. The growth rate, surface morphology, hydrophobicity and the structural, optical and electrical properties of as-grown films with thicknesses ˜65-420 nm were recorded for the three oxygen pressures. The growth rates were found to be highly linear both as a function of film thickness and oxygen pressure, indicating high reproducibility. All the films were optically smooth, hydrophobic and nanostructured with lateral grain shapes of ˜150 nm wide. This was found compatible with the deposition of condensed nanoclusters, formed in the ablation plume, on a cold and amorphous substrate. Films were nanocrystalline (wurtzite structure), c-axis oriented, with average crystallite size ˜22 nm for ZnO and ˜16 nm for AZO. In-plane compressive stress values of 2-3 GPa for ZnO films and 0.5 GPa for AZO films were found. Films also displayed high transmission greater than 95% in some cases, in the 400-800 nm wavelength range. The low temperature photoluminescence spectra of all the ZnO and AZO films showed intense near band edge emission. A considerable spread from semi-insulating to n-type conductive was observed for the films, with resistivity ˜103 Ω cm and Hall mobility in 4-14 cm2 V-1 s-1 range, showing marked dependences on film thickness and oxygen pressure. Applications in the fields of microfluidic devices and flexible electronics for these ZnO and AZO films are suggested.

  3. Highly textured Sr, Nb co-doped BiFeO{sub 3} thin films grown on SrRuO{sub 3}/Si substrates by rf- sputtering

    SciTech Connect

    Ostos, C.; Raymond, O.; Siqueiros, J. M.; Suarez-Almodovar, N.; Bueno-Baques, D.; Mestres, L.

    2011-07-15

    In this study, (011)-highly oriented Sr, Nb co-doped BiFeO{sub 3} (BFO) thin films were successfully grown on SrRuO{sub 3}/Si substrates by rf-magnetron sputtering. The presence of parasite magnetic phases was ruled out based on the high resolution x-ray diffraction data. BFO films exhibited a columnar-like grain growth with rms surface roughness values of {approx_equal}5.3 nm and average grain sizes of {approx_equal}65-70 nm for samples with different thicknesses. Remanent polarization values (2P{sub r}) of 54 {mu}C cm{sup -2} at room temperature were found for the BFO films with a ferroelectric behavior characteristic of an asymmetric device structure. Analysis of the leakage mechanisms for this structure in negative bias suggests Schottky injection and a dominant Poole-Frenkel trap-limited conduction at room temperature. Oxygen vacancies and Fe{sup 3+}/Fe{sup 2+} trap centers are consistent with the surface chemical bonding states analysis from x-ray photoelectron spectroscopy data. The (011)-BFO/SrRuO{sub 3}/Si film structure exhibits a strong magnetic interaction at the interface between the multiferroic film and the substrate layer where an enhanced ferromagnetic response at 5 K was observed. Zero-field cooled (ZFC) and field cooled (FC) magnetization curves of this film system revealed a possible spin glass behavior at spin freezing temperatures below 30 K depending on the BFO film thickness.

  4. Sb[subscript 2]Te[subscript 3] and Bi[subscript 2]Te[subscript 3] Thin Films Grown by Room-Temperature MBE

    SciTech Connect

    Aabdin, Z.; Peranio, N.; Winkler, M.; Bessas, D.; König, J.; Hermann, R.P.; Böttner, H.; Eibl, O.

    2012-10-23

    Sb{sub 2}Te3 and Bi{sub 2}Te3 thin films were grown on SiO{sub 2} and BaF{sub 2} substrates at room temperature using molecular beam epitaxy. Metallic layers with thicknesses of 0.2 nm were alternately deposited at room temperature, and the films were subsequently annealed at 250 C for 2 h. x-Ray diffraction and energy-filtered transmission electron microscopy (TEM) combined with high-accuracy energy-dispersive x-ray spectrometry revealed stoichiometric films, grain sizes of less than 500 nm, and a texture. High-quality in-plane thermoelectric properties were obtained for Sb{sub 2}Te3 films at room temperature, i.e., low charge carrier density (2.6 x 10{sup 19} cm{sup -3}, large thermopower (130 {micro}V K{sup -1}), large charge carrier mobility (402 cm{sup 2} V{sup -1} s{sup -1}), and resulting large power factor (29 {micro}W cm{sup -1} K{sup -2}). Bi{sub 2}Te3 films also showed low charge carrier density (2.7 x 10{sup 19} cm{sup -3}), moderate thermopower (-153 {micro}V K{sup -1}), but very low charge carrier mobility (80 cm{sup 2} V{sup -1} s{sup -1}), yielding low power factor (8 {micro}W cm{sup -1} K{sup -2}). The low mobilities were attributed to Bi-rich grain boundary phases identified by analytical energy-filtered TEM.

  5. Spectroscopic ellipsometry-based study of optical properties of amorphous and crystalline ZnSnO alloys and Zn2SnO4 thin films grown using sputtering deposition: Dielectric function and subgap states

    NASA Astrophysics Data System (ADS)

    Ko, Kun Hee; So, Hyeon Seob; Jung, Dae Ho; Park, Jun Woo; Lee, Hosun

    2016-04-01

    We investigated the optical properties of amorphous and crystalline zinc tin oxide (ZTO) thin films grown on SiO2/Si substrates with varying compositions via a co-sputtering deposition method at room temperature. The co-sputtering targets consist of SnO2 and ZnO. By varying the relative power ratio of the two targets, we demonstrate the ability to control the Sn and Zn composition of the resulting ZTO thin films. The ratio of [Sn]/([Sn] + [Zn]) atomic compositions was estimated at 11%, 29%, 42%, 54%, and 60%. Using a 600 °C annealing process, the as-grown amorphous ZTO films were transformed into crystalline ZTO films. The dielectric functions were obtained based on the measured ellipsometric angles, ψ and Δ. We determined the dielectric functions, absorption coefficients, and optical gap energies of ZTO thin films with varying compositions. The dielectric functions, absorption coefficients, and optical gap energies of amorphous and crystalline Zn2SnO4 thin films were obtained at 29 at. % of Sn. Subgap states at 1.6 eV (A) and 2.8 eV (B) of ZnSnO alloys and Zn2SnO4 films were found in the imaginary part of the dielectric function spectra. The subgap state intensities were reduced via a nitrogen gas annealing. Possible origins of the observed subgap states will be discussed.

  6. Effect of NiO inserted layer on spin-Hall magnetoresistance in Pt/NiO/YIG heterostructures

    NASA Astrophysics Data System (ADS)

    Shang, T.; Zhan, Q. F.; Yang, H. L.; Zuo, Z. H.; Xie, Y. L.; Liu, L. P.; Zhang, S. L.; Zhang, Y.; Li, H. H.; Wang, B. M.; Wu, Y. H.; Zhang, S.; Li, Run-Wei

    2016-07-01

    We investigate spin-current transport with an antiferromagnetic insulator NiO thin layer by means of the spin-Hall magnetoresistance (SMR) over a wide range of temperature in Pt/NiO/Y3Fe5O12 (Pt/NiO/YIG) heterostructures. The SMR signal is comparable to that without the NiO layer as long as the temperature is near or above the blocking temperature of the NiO, indicating that the magnetic fluctuation of the insulating NiO is essential for transmitting the spin current from the Pt to YIG layer. On the other hand, the SMR signal becomes negligibly small at low temperature, and both conventional anisotropic magnetoresistance and the anomalous Hall resistance are extremely small at any temperature, implying that the insertion of the NiO has completely suppressed the Pt magnetization induced by the YIG magnetic proximity effect (MPE). The dual roles of the thin NiO layer are, to suppress the magnetic interaction or MPE between Pt and YIG, and to maintain efficient spin current transmission at high temperature.

  7. Bridging exchange bias effect in NiO and Ni(core)@NiO(shell) nanoparticles

    NASA Astrophysics Data System (ADS)

    Rinaldi-Montes, Natalia; Gorria, Pedro; Martínez-Blanco, David; Fuertes, Antonio B.; Fernández Barquín, Luis; Puente-Orench, Inés; Blanco, Jesús A.

    2016-02-01

    Among all bi-magnetic core(transition metal)@shell(transition metal oxide) nanoparticles (NPs), Ni@NiO ones show an onset temperature for the exchange bias (EB) effect far below the Néel temperature of bulk antiferromagnetic NiO. In this framework, the role played by the magnetism of NiO at the nanoscale is investigated by comparing the microstructure and magnetic properties of NiO and Ni@NiO NPs. With the aim of bridging the two systems, the diameter of the NiO NPs (~4 nm) is chosen to be comparable to the shell thickness of Ni@NiO ones (~2 nm). The EB effect in Ni@NiO NPs is attributed to the exchange coupling between the core and the shell, with an interfacial exchange energy of ΔE~0.06 erg cm-2, thus comparable to previous reports on Ni/NiO interfaces both in thin film and NP morphologies. In contrast, the EB detected in NiO NPs is explained in a picture where uncompensated spins located on a magnetically disordered surface shell are exchange coupled to the antiferromagnetic core. In all the studied NPs, the variation of the EB field as a function of temperature is described according to a negative exponential law with a similar decay constant, yielding a vanishing EB effect around T~40-50 K. In addition, the onset temperature for the EB effect in both NiO and Ni@NiO NPs seems to follow a universal dependence with the NiO crystallite size.

  8. Ferroelectric properties of Pb(Mn{sub 1/3}Nb{sub 2/3})O{sub 3}-Pb(Zr,Ti)O{sub 3} thin films epitaxially grown on (001)MgO substrates

    SciTech Connect

    Zhang Tao; Wasa, Kiyotaka; Kanno, Isaku; Zhang Shuyi

    2008-07-15

    Ferroelectric ternary perovskite thin films of 0.06Pb(Mn{sub 1/3},Nb{sub 2/3})O{sub 3} (PMnN)-0.42PbZrO{sub 3} (PZ)-0.52PbTiO{sub 3} (PT)[0.06PMnN-0.94PZT(45/55)] have been grown on the (001)MgO substrates by radio frequency-magnetron sputtering with quenching processing. The deposition conditions, microstructures, piezoelectric, and ferroelectric properties of the ternary perovskite thin films are described in comparison with the binary compounds of PZ-PT (PZT). The out-plane x-ray diffraction (XRD) measurements for the ternary PMnN-PZT perovskite thin films of 1 to 1-3 {mu}m in film thickness show strong single (001) orientation. The in-plane {phi}-scan XRD curve verified the ternary thin films are single crystals of perovskite structure. Their lattice parameters are almost the same as bulk values and the ternary thin films are almost stress free. The PMnN-PZT thin films show high density without columnar structure. The PZT-based ternary perovskite thin films with the small addition of PMnN, i.e., 6 mole % PMnN, exhibit a strong hard ferroelectric response, i.e., P{sub s}=60 {mu}C/cm{sup 2} and 2E{sub c}=230 kV/cm. Their effective piezoelectric constants are typically e{sub 31,eff}=-7.7 C/m{sup 2}. These values are slightly higher than those of binary perovskite PZT thin 0011fil.

  9. High-tunability and low-microwave-loss Ba0.6Sr0.4TiO3 thin films grown on high-resistivity Si substrates using TiO2 buffer layers

    NASA Astrophysics Data System (ADS)

    Kim, Hyun-Suk; Kim, Ho-Gi; Kim, Il-Doo; Kim, Ki-Byoung; Lee, Jong-Chul

    2005-11-01

    In this Letter, we report on high-tunability and low-microwave-loss properties of Ba0.6Sr0.4TiO3 (BST) thin films by use of atomic-layer-deposited TiO2 films as the microwave buffer layer between BST and high-resistivity Si substrate. The interdigital capacitor fabricated on BST films grown on TiO2/high resistivity Si (2kΩcm) substrates showed the much enhanced tunability value of 33.2% while retaining an appropriate Q factor, as compared to the tunability values of BST (21%) films grown on MgO single-crystal substrates and BST (8.2%) films grown on TiO2/normal Si (10Ωcm) substrates. The coplanar waveguide BST phase shifter fabricated on TiO2/high resistivity Si exhibited a phase shift of 95° and insertion loss of 3.09 dB at 15 GHz and an applied voltage of 50 V. ALD-grown TiO2 buffer layers enable the successful integration of BST-based microwave tunable devices onto high-resistivity Si wafers.

  10. Role of an ultra-thin AlN/GaN superlattice interlayer on the strain engineering of GaN films grown on Si(110) and Si(111) substrates by plasma-assisted molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Shen, X. Q.; Takahashi, T.; Rong, X.; Chen, G.; Wang, X. Q.; Shen, B.; Matsuhata, H.; Ide, T.; Shimizu, M.

    2013-12-01

    We investigate the role of an ultra-thin AlN/GaN superlattice interlayer (SL-IL) on the strain engineering of the GaN films grown on Si(110) and Si(111) substrates by plasma-assisted molecular beam epitaxy. It is found that micro-cracks limitted only at the SL-IL position are naturally generated. These micro-cracks play an important role in relaxing the tensile strain caused by the difference of the coefficient of thermal expansion between GaN and Si and keeping the residual strain in the crack-free GaN epilayers resulted from the SL-IL during the growth. The mechanism understanding of the strain modulation by the SL-IL in the GaN epilayers grown on Si substrates makes it possible to design new heterostructures of III-nitrides for optic and electronic device applications.

  11. Role of an ultra-thin AlN/GaN superlattice interlayer on the strain engineering of GaN films grown on Si(110) and Si(111) substrates by plasma-assisted molecular beam epitaxy

    SciTech Connect

    Shen, X. Q.; Takahashi, T.; Matsuhata, H.; Ide, T.; Shimizu, M.; Rong, X.; Chen, G.; Wang, X. Q.; Shen, B.

    2013-12-02

    We investigate the role of an ultra-thin AlN/GaN superlattice interlayer (SL-IL) on the strain engineering of the GaN films grown on Si(110) and Si(111) substrates by plasma-assisted molecular beam epitaxy. It is found that micro-cracks limitted only at the SL-IL position are naturally generated. These micro-cracks play an important role in relaxing the tensile strain caused by the difference of the coefficient of thermal expansion between GaN and Si and keeping the residual strain in the crack-free GaN epilayers resulted from the SL-IL during the growth. The mechanism understanding of the strain modulation by the SL-IL in the GaN epilayers grown on Si substrates makes it possible to design new heterostructures of III-nitrides for optic and electronic device applications.

  12. Giant magnetocaloric effect of Mn{sub 0.92}Ba{sub 0.08}As thin film grown on Al{sub 2}O{sub 3}(0001) substrate

    SciTech Connect

    Dang Duc Dung; Duong Anh Tuan; Duong Van Thiet; Shin, Yooleemi; Cho, Sunglae

    2012-04-01

    The epitaxial Mn{sub 0.92}Ba{sub 0.08}As thin film was grown on Al{sub 2}O{sub 3}(0001) substrate by molecular beam epitaxy. The Curie temperature (T{sub C}) around 350 K was enhanced with the addition of Ba, compared to that of bulk MnAs (T{sub C} {approx} 318 K). We have observed the linear resistivity versus the square of temperature and high negative magnetoresistance near Curie temperature. Moreover, the giant magnetocaloric effect was found with maximum magnetic entropy change, 65 J/kgK, around room temperature at 5 T.

  13. Effects of air annealing on CdS quantum dots thin film grown at room temperature by CBD technique intended for photosensor applications

    SciTech Connect

    Shaikh, Shaheed U.; Desale, Dipalee J.; Siddiqui, Farha Y.; Ghosh, Arindam; Birajadar, Ravikiran B.; Ghule, Anil V.; Sharma, Ramphal

    2012-11-15

    Graphical abstract: The effect of different intensities (40, 60 100 and 200 W) of light on CdS quantum dots thin film annealed at 350 °C indicating enhancement in (a) photo-current and (b) photosensitivity. Highlights: ► The preparation of CdS nanodot thin film at room temperature by M-CBD technique. ► Study of air annealing on prepared CdS nanodots thin film. ► The optimized annealing temperature for CdS nanodot thin film is 350 °C. ► Modified CdS thin films can be used in photosensor application. -- Abstract: CdS quantum dots thin-films have been deposited onto the glass substrate at room temperature using modified chemical bath deposition technique. The prepared thin films were further annealed in air atmosphere at 150, 250 and 350 °C for 1 h and subsequently characterized by scanning electron microscopy, ultraviolet–visible spectroscopy, electrical resistivity and I–V system. The modifications observed in morphology and opto-electrical properties of the thin films are presented.

  14. Direct observation of infinite NiO2 planes in LaNiO2 films

    NASA Astrophysics Data System (ADS)

    Ikeda, Ai; Krockenberger, Yoshiharu; Irie, Hiroshi; Naito, Michio; Yamamoto, Hideki

    2016-06-01

    Epitaxial thin films of LaNiO2, which is an oxygen-deficient perovskite with “infinite layers” of Ni1+O2, were prepared by a low-temperature reduction of LaNiO3 single-crystal films on NdGaO3 substrates. We report the high-angle annular dark-field and bright-field scanning transmission electron microscopy observations of infinite NiO2 planes of c-axis-oriented LaNiO2 epitaxial thin films with a layer stacking sequence of NiO2/La/NiO2. Resistivity measurements on the films show T 2 dependence between 400 and 150 K and a negative Hall coefficient.

  15. Preparation and characterization of Cu2ZnSnSe4 thin films grown from ZnSe and Cu2SnS3 precursors in a two stage process

    NASA Astrophysics Data System (ADS)

    Moreno, R.; Leguizamon, A.; Hurtado, M.; Guzmán, F.; Gordillo, G.

    2014-04-01

    Compound of the kesterite familie has been considered as an alternative absorber layer in the manufacture of thin film solar cells due to its earth abundant and environmental friendly constituents and high absorption coefficient. In this work we propose a new route to grow single phase Cu2ZnSnSe4 (CZTSe) thin films with tetragonal-kesterite type structure; this consist in sequential evaporation of thin films of CuSe, SnSe and ZnSe in a two stage process. Measurements of X-ray diffraction (XRD) revealed the formation of the Cu2ZnSnSe4 compound, grown with tetragonal Kësterite type structure. Optical characterization performed through spectral transmittance measurements established that this compound has high absorption (absorption coefficient > 104 cm-1) and a forbidden energy gap of 1.46 eV; these results indicate that the CZTSe thin films we have prepared has properties suitable for later use as absorber layer in solar cells. Results regarding electrical transport properties determined from temperature dependent conductivity measurements are also reported.

  16. Ferroelectric properties and crystalline structures of BaMgF{sub 4} thin films grown on Pt(111)/SiO{sub 2}/Si(100)

    SciTech Connect

    Moriwaki, Masashi; Aizawa, Koji; Tokumitsu, Eisuke; Ishiwara, Hiroshi

    1997-07-01

    Crystalline quality and ferroelectric properties of (120)-oriented BaMgF{sub 4}(BMF) films grown on Pt(111)/SiO{sub 2}/Si(100) and n-Si(111) substrates have been investigated. The BaMgF{sub 4} films grown on Pt(111) have large and flat grains, while the films on Si(111) have small grains. The C-V curve of BaMgF{sub 4}/Pt(111)/SiO{sub 2}/Si(100) diodes showed a hysteresis loop with a memory window of 3.8V.

  17. Epitaxial Ba{sub 2}IrO{sub 4} thin-films grown on SrTiO{sub 3} substrates by pulsed laser deposition

    SciTech Connect

    Nichols, J. Korneta, O. B.; Terzic, J.; Cao, G.; Brill, J. W.; Seo, S. S. A.

    2014-03-24

    We have synthesized epitaxial Ba{sub 2}IrO{sub 4} (BIO) thin-films on SrTiO{sub 3} (001) substrates by pulsed laser deposition and studied their electronic structure by dc-transport and optical spectroscopic experiments. We have observed that BIO thin-films are insulating but close to the metal-insulator transition boundary with significantly smaller transport and optical gap energies than its sister compound, Sr{sub 2}IrO{sub 4}. Moreover, BIO thin-films have both an enhanced electronic bandwidth and electronic-correlation energy. Our results suggest that BIO thin-films have great potential for realizing the interesting physical properties predicted in layered iridates.

  18. Full Field Birefringence Measurement of Grown-In Stresses in Thin Silicon Sheet: Final Technical Report, 2 January 2002 - 15 January 2008

    SciTech Connect

    Danyluk, S.; Ostapenka, S.

    2008-11-01

    This paper summarizes polariscopy work that led to prototype non-contact, near-infrared light-transmission system for inspecting thin, flat, large-area Si wafers. Acoustic work led to commercially viable system to inspect wafers for microcracks.

  19. Crystal growth and photoluminescence characteristics of Ca{sub 2}MgSi{sub 2}O{sub 7}:Eu{sup 3+} thin films grown by pulsed laser deposition

    SciTech Connect

    Yang, Hyun Kyoung; Moon, Byung Kee; Choi, Byung Chun; Jeong, Jung Hyun; Kim, Kwang Ho

    2012-10-15

    Ca{sub 2}MgSi{sub 2}O{sub 7}:Eu{sup 3+} films were deposited on Al{sub 2}O{sub 3} (0 0 0 1) substrates by pulsed laser deposition. The films were grown at various oxygen pressures ranging from 100 to 400 mTorr. The crystallinity and surface morphology of the films were examined by X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. XRD and AFM respectively showed that the Ca{sub 2}MgSi{sub 2}O{sub 7}:Eu{sup 3+} films had a zircon structure and consisted of homogeneous grains ranging from 100 to 400 nm depending on the deposition conditions. The radiation emitted was dominated by a red emission peak at 620 nm. The maximum PL intensity of the Ca{sub 2}MgSi{sub 2}O{sub 7}:Eu{sup 3+} films grown at 300 mTorr was increased by a factor of 1.3 compared to that of Ca{sub 2}MgSi{sub 2}O{sub 7}:Eu{sup 3+} films grown at 100 mTorr. The crystallinity, surface roughness and photoluminescence of the thin-film phosphors were strongly dependent on the deposition conditions, in particular, the oxygen partial pressure.

  20. Microstructure and possible strain relaxation mechanisms of La{sub 2}CuO{sub 4+{delta}} thin films grown on LaSrAlO{sub 4} and SrTiO{sub 3} substrates

    SciTech Connect

    He, Jiaqing; Klie, Robert F.; Logvenov, Gennady; Bozovic, Ivan; Zhu, Yimei

    2007-04-01

    Layered perovskite La{sub 2}CuO{sub 4+{delta}} (LCO) thin films were epitaxially grown on SrTiO{sub 3} (STO) and LaSrAlO{sub 4} substrates by atomic-layer-by-layer molecular beam epitaxy. The lattice defects and residual strain in these films were investigated by means of transmission electron microscopy and electron energy loss spectroscopy. The LCO films showed a high epitaxial quality with flat interfaces and top surfaces. Misfit dislocations with Burgers vector a<010> and shear defects were frequently observed at or near the film/substrate interfaces and in the films, respectively. In one LCO film, grown on STO at the highest temperature, 700 degree sign C, we observed a two layered structure with the top layer being rhombohedral CuLaO{sub 2}. In addition, stacking faults were observed in the plane views of one LCO film grown on the STO substrate. The residual strains were evaluated from the associated splitting of Bragg reflection. Possible mechanisms of strain relaxations are discussed based on the observed defects.

  1. Effects of substrate conductivity on cell morphogenesis and proliferation using tailored, atomic layer deposition-grown ZnO thin films

    PubMed Central

    Choi, Won Jin; Jung, Jongjin; Lee, Sujin; Chung, Yoon Jang; Yang, Cheol-Soo; Lee, Young Kuk; Lee, You-Seop; Park, Joung Kyu; Ko, Hyuk Wan; Lee, Jeong-O

    2015-01-01

    We demonstrate that ZnO films grown by atomic layer deposition (ALD) can be employed as a substrate to explore the effects of electrical conductivity on cell adhesion, proliferation, and morphogenesis. ZnO substrates with precisely tunable electrical conductivity were fabricated on glass substrates using ALD deposition. The electrical conductivity of the film increased linearly with increasing duration of the ZnO deposition cycle (thickness), whereas other physical characteristics, such as surface energy and roughness, tended to saturate at a certain value. Differences in conductivity dramatically affected the behavior of SF295 glioblastoma cells grown on ZnO films, with high conductivity (thick) ZnO films causing growth arrest and producing SF295 cell morphologies distinct from those cultured on insulating substrates. Based on simple electrostatic calculations, we propose that cells grown on highly conductive substrates may strongly adhere to the substrate without focal-adhesion complex formation, owing to the enhanced electrostatic interaction between cells and the substrate. Thus, the inactivation of focal adhesions leads to cell proliferation arrest. Taken together, the work presented here confirms that substrates with high conductivity disturb the cell-substrate interaction, producing cascading effects on cellular morphogenesis and disrupting proliferation, and suggests that ALD-grown ZnO offers a single-variable method for uniquely tailoring conductivity. PMID:25897486

  2. Effects of confinements on morphology of In{sub x}Ga{sub 1–x}As thin film grown on sub-micron patterned GaAs substrate: Elastoplastic phase field model

    SciTech Connect

    Arjmand, M.; Deng, J.; Swaminathan, N.; Morgan, D.; Szlufarska, I.

    2014-09-21

    An elastoplastic phase field model is developed to investigate the role of lateral confinement on morphology of thin films grown heteroepitaxially on patterned substrates. Parameters of the model are chosen to represent In{sub x}Ga{sub 1-x}As thin films growing on GaAs patterned with SiO₂. We determined the effect of misfit strain on morphology of thin films grown in 0.5 μm patterns with non-uniform deposition flux. Growth of islands inside patterns can be controlled by non-uniformity of deposition flux, misfit strain between film and the substrate, and also strain energy relaxation due to plastic deformation. Our results show that the evolution of island morphology depends non-monotonically on indium content and associated misfit strain due to coupling between the plastic relaxation and the confinements effects. Low indium concentration (0%–40%) causes formation of instabilities with relatively long wavelengths across the width of the pattern. Low surface diffusion (due to low indium concentration) and fewer islands across the pattern (due to small misfit strain) lead to formation and growth of islands near the walls driven by overflow flux. Further increase in indium concentration (40%–75%) increases the lattice mismatch and surface diffusivity of the film, and also activates plastic deformation mechanism, which leads to coalescence of islands usually away from the edges. By further increasing the indium concentration (up to 100%), plastic deformation relaxes most of the strain energy density of the film, which prevents formation of instabilities in the film. Hence, in this case, islands are only formed near the walls.

  3. Controllable synthesis of 3D Ni(OH)2 and NiO nanowalls on various substrates for high-performance nanosensors.

    PubMed

    Li, Guanghui; Wang, Xuewen; Liu, Lin; Liu, Rui; Shen, Fangping; Cui, Zheng; Chen, Wei; Zhang, Ting

    2015-02-11

    Large-area and uniform three-dimensional (3D) β-Ni(OH)2 and NiO nanowalls were synthesized on a variety of rigid and flexible substrates via a simple aqueous chemical deposition process. The β-Ni(OH)2 nanowalls consist of single-crystal Ni(OH)2 nanosheets that were vertically grown on different substrates. The height, crystallinity, and morphology of the Ni(OH)2 nanowalls can be readily modified by adjusting the reaction time and concentration of the NiCl2 solution. The synthesis mechanism of the Ni(OH)2 nanowalls was determined through heterogeneous nucleation and subsequent oriented crystal growth. 3D NiO nanowalls were obtained by thermal decomposition of the Ni(OH)2 nanowalls at 400 °C in Ar atmosphere. Highly sensitive, selective gas sensors and electrochemical sensors based on these NiO nanowalls were developed. The chemiresistive gas sensors based on the NiO nanowalls grown on ceramic substrates exhibited an excellent performance with low detection limit for formaldehyde (8 ppb) and NO2 (15 ppb). The electrochemical sensor based on the NiO nanowalls grown on an FTO glass substrate had a superior selectivity to non-enzymatic glucose with a detection limit of 200 nm. PMID:25273523

  4. Design of a compact waveguide optical isolator based on multimode interferometers using magneto-optical oxide thin films grown on silicon-on-insulator substrates.

    PubMed

    Shui, Keyi; Nie, Lixia; Zhang, Yan; Peng, Bo; Xie, Jianliang; Deng, Longjiang; Bi, Lei

    2016-06-13

    We report the design of a waveguide optical isolator based on multimode interferometer (MMI) structure using silicon on insulator (SOI) and deposited magneto-optical (MO) thin films. The optical isolator is based on a vertical 1 × 2 SOI MMI utilizing the nonreciprocal phase shift (NRPS) difference of different TM modes of the MO garnet thin film/SOI waveguide. By constructing a silicon/MO thin film/silicon structure, we demonstrate that the NRPS of the fundamental and first order TM modes can show opposite signs for certain device dimensions, therefore significantly reduce the device length. For a 310.42 μm long device, 20 dB isolation bandwidth larger than 1.6 nm with total insertion loss of 0.817 dB is achieved at 1550 nm wavelength. The fabrication tolerances and materials losses are also discussed to satisfy the state-of-the-art fabrication technology and material properties. PMID:27410305

  5. Effects of crystalline and elastic anisotropies on coercivity of longitudinally oriented CoCrPt thin films grown on CrW underlayer

    NASA Astrophysics Data System (ADS)

    Liu, Xi; Li, Zhenghua; Shi, Wenkui; Li, Songtian; Wei, Fulin; Wei, Dan; Liu, Xiaoxi

    2009-04-01

    The longitudinal CoCrPt thin films have been prepared on CrW underlayer at room temperature. The dependence of CoCrPt's structure and magnetic properties on the Pt content was investigated. The addition of platinum element in the CoCrPt magnetic layer increases the lattice constant and longitudinal coercivity of the CoCrPt thin films. The coercivity mechanism of the CoCrPt thin film is analyzed by using the micromagnetic models, with careful discussions of the uniaxial crystalline anisotropy and the magnetostriction. It is found that the magnetostriction effects play an important role on the coercivity mechanisms when the Pt content is more than 15 at. % Pt concentrate.

  6. Tuning of in-plane optical anisotropy by inserting ultra-thin InAs layer at interfaces in (001)-grown GaAs/AlGaAs quantum wells

    SciTech Connect

    Yu, J. L.; Cheng, S. Y.; Lai, Y. F.; Zheng, Q.

    2015-01-07

    The in-plane optical anisotropy (IPOA) in (001)-grown GaAs/AlGaAs quantum wells (QWs) with different well widths varying from 2 nm to 8 nm has been studied by reflectance difference spectroscopy. Ultra-thin InAs layers with thickness ranging from 0.5 monolayer (ML) to 1.5 ML have been inserted at GaAs/AlGaAs interfaces to tune the asymmetry in the QWs. It is demonstrated that the IPOA can be accurately tailored by the thickness of the inserted ultra-thin InAs layer at the interfaces. Strain-induced IPOA has also been extracted by using a stress apparatus. We find that the intensity of the strain-induced IPOA decreases with the thickness of the inserted InAs layer, while that of the interface-induced IPOA increases with the thickness of the InAs layer. Theoretical calculations based on 6 band k ⋅ p theory have been carried out, and good agreements with experimental results are obtained. Our results demonstrate that, the IPOA of the QWs can be greatly and effectively tuned by inserting an ultra-thin InAs layer with different thicknesses at the interfaces of QWs, which does not significantly influence the transition energies and the transition probability of QWs.

  7. Single phase, single orientation Cu2O (1 0 0) and (1 1 0) thin films grown by plasma-assisted molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Tolstova, Yulia; Wilson, Samantha S.; Atwater, Harry A.

    2015-01-01

    Epitaxial growth of cuprous oxide (Cu2O) has been achieved on (1 0 0) and (1 1 0) orientations of MgO by plasma-assisted molecular beam epitaxy. Growth was investigated using a pure oxygen plasma as well as a 90%Ar/10%O2 plasma. Cu2O films grown using pure oxygen on MgO (1 0 0) have a limited growth window and typically exhibit multiple phases and orientations. Films grown on MgO (1 1 0) using pure oxygen are phase stable and predominantly (1 1 0) oriented, with some (2 0 0) orientation present. Films grown using an Ar/O2 plasma on MgO (1 0 0) have improved phase stability and a single (1 1 0) orientation. Growth on MgO (1 1 0) using an Ar/O2 plasma yields highly reproducible (1 1 0) oriented single phase Cu2O films with a much wider growth window, suggesting that this substrate orientation is preferable for Cu2O phase stability.

  8. Laser damage properties of TiO{sub 2}/Al{sub 2}O{sub 3} thin films grown by atomic layer deposition

    SciTech Connect

    Wei Yaowei; Liu Hao; Sheng Ouyang; Liu Zhichao; Chen Songlin; Yang Liming

    2011-08-20

    Research on thin film deposited by atomic layer deposition (ALD) for laser damage resistance is rare. In this paper, it has been used to deposit TiO{sub 2}/Al{sub 2}O{sub 3} films at 110 deg. C and 280 deg. C on fused silica and BK7 substrates. Microstructure of the thin films was investigated by x-ray diffraction. The laser-induced damage threshold (LIDT) of samples was measured by a damage test system. Damage morphology was studied under a Nomarski differential interference contrast microscope and further checked under an atomic force microscope. Multilayers deposited at different temperatures were compared. The results show that the films deposited by ALD had better uniformity and transmission; in this paper, the uniformity is better than 99% over 100 mm {Phi} samples, and the transmission is more than 99.8% at 1064 nm. Deposition temperature affects the deposition rate and the thin film microstructure and further influences the LIDT of the thin films. As to the TiO{sub 2}/Al{sub 2}O{sub 3} films, the LIDTs were 6.73{+-}0.47 J/cm{sup 2} and 6.5{+-}0.46 J/cm{sup 2} at 110 deg. C on fused silica and BK7 substrates, respectively. The LIDTs at 110 deg. C are notably better than 280 deg. C.

  9. Structural and electrical properties of pure and Cu doped NiO films deposited at various oxygen partial pressures

    NASA Astrophysics Data System (ADS)

    Reddy, Y. Ashok Kumar; Reddy, A. Mallikarjuna; Reddy, A. Sivasankar; Reddy, P. Sreedhara

    2013-02-01

    Pure and Cu doped NiO thin films were successfully deposited by dc reactive magnetron sputtering technique at various oxygen partial pressures in the range 9 × 10-5 to 6 × 10-4 mbar. It was observed that oxygen partial pressure influence the structural and electrical properties. All the deposited films were polycrystalline and exhibited cubic structure with preferential growth along (220) plane for NiO films and (111) and (220) planes for Cu doped NiO films. All the deposited films exhibited p-type conductivity. The electrical resistivity decreased from 62.24 to 9.94 Ω cm and the mobility and carrier concentration were increased with oxygen partial pressure.

  10. Synthesis of NiO nanowalls by thermal treatment of Ni film deposited onto a stainless steel substrate.

    PubMed

    Zhang, Kaili; Rossi, Carole; Alphonse, Pierre; Tenailleau, Christophe

    2008-04-16

    Two-dimensional nanostructures have a variety of applications due to their large surface areas. In this study, the authors present a simple and convenient method to realize two-dimensional NiO nanowalls by thermal treatment of a Ni thin film deposited by sputtering onto a stainless steel substrate. The substrate surface area is supposed to be significantly increased by creating nanowalls. The effects on the nanowall morphology of the thermal treatment temperature and duration are investigated. A mechanism based on the surface diffusion of Ni(2+) ions from the Ni base film is then proposed for the growth of the NiO nanowalls. The as-synthesized NiO nanowalls are characterized by scanning electron microscopy, energy-dispersive x-ray analysis, x-ray diffraction, transmission electron microscopy and high resolution transmission electron microscopy. PMID:21825619

  11. The study of in situ scanning tunnelling microscope characterization on GaN thin film grown by plasma assisted molecular beam epitaxy

    SciTech Connect

    Yang, R.; Krzyzewski, T.; Jones, T.

    2013-03-18

    The epitaxial growth of GaN by Plasma Assisted Molecular Beam Epitaxy was investigated by Scanning Tunnelling Microscope (STM). The GaN film was grown on initial GaN (0001) and monitored by in situ Reflection High Energy Electron Diffraction and STM during the growth. The STM characterization was carried out on different sub-films with increased thickness. The growth of GaN was achieved in 3D mode, and the hexagonal edge of GaN layers and growth gradient were observed. The final GaN was of Ga polarity and kept as (0001) orientation, without excess Ga adlayers or droplets formed on the surface.

  12. Piezoelectric force microscopy studies of PbTiO{sub 3} thin films grown via layer-by-layer gas phase reaction.

    SciTech Connect

    Park, M.; Hong, S.; Kim, J.; Kim, Y.; Buehlmann, S.; Kim, Y. K.; No, K.; Materials Science Division; Korea Advanced Inst. of Science and Technology; Imperial Col.; Samsung Electronics

    2009-01-01

    We fabricated 20 nm thick PbTiO{sub 3} films via reactive magnetron sputtering and studied the domain switching phenomena and retention properties using piezoresponse force microscopy. We found that multistep deposited PbTiO{sub 3} thin films showed 29% smaller rms roughness (2.5 versus 3.5 nm), 28% smaller coercive voltage (1.68 versus 2.32 V), 100% higher d{sub 33} value, and improved retention characteristic (89% versus 52% of remained poled domain area in 1280 min after poling) than single-step deposited PbTiO{sub 3} thin films. We attribute the improvement to the more complete chemical reaction between PbO and TiO{sub 2} during the film growth.

  13. Superconducting MgB2 thin films grown by pulsed laser deposition on Al2O3(0001) and MgO(100) substrates

    NASA Astrophysics Data System (ADS)

    Wang, S. F.; Dai, S. Y.; Zhou, Y. L.; Chen, Z. H.; Cui, D. F.; Xu, J. D.; He, M.; Lu, H. B.; Yang, G. Z.; Fu, G. S.; Han, L.

    2001-11-01

    Superconducting MgB2 thin films were fabricated on Al2O3(0001) and MgO(100) substrates by a two-step method. Boron thin films were deposited by pulsed laser deposition followed by an ex-situ annealing process. Resistance measurements of the deposited MgB2 films show a Tc of 38.6 K for MgB2/Al2O3 and 38.1 K for MgB2/MgO. Atomic force microscopy, scanning electron microscopy and x-ray diffraction were used to study the properties of the films. The results indicate that the MgB2/Al2O3 films consist of well-crystallized grains with a highly c-axis-oriented structure while the MgB2/MgO films have a dense uniform appearance with an unfixed orientation.

  14. Spin and magnetization compensation points in LPE-grown Y 2.4Eu 0.6Ga yFe 5-yO 12 garnet thin films

    NASA Astrophysics Data System (ADS)

    Singh, L. N.; Srivastava, C. M.

    1993-11-01

    The effective g-factor, geff, the uniaxial anisotropy, Hu, Gilbert's damping parameter, α, and linewidths Δ H‖ and Δ H⊥ for liquid phase epitaxially grown thin films of composition Eu 0.6Y 2.4Ga yFe 5- yO 12 (0.9⩽ y ⩽1.6) have been investigated in the spin compensation region. It is found that the spin compensation point ( yS) occurs at y = 1.29, while the magnetization compensation point ( ym) occurs at y = 1.22 giving yS- ym = 0.07. The damping parameter α as well as γ eff/α for both the parallel and perpendicular resonance configurations are found to diverge at the S-compensation point while the anisotropy field diverges at the M-compensation point.

  15. Ferromagnetism and magneto-transport properties of Mn{sub 0.92}Ca{sub 0.08}As thin film grown on Al{sub 2}O{sub 3}(0001) substrate

    SciTech Connect

    Dung, Dang Duc; Van Thiet, Duong; Anh Tuan, Duong; Cho, Sunglae; Feng, Wuwei

    2014-05-07

    The epitaxial Mn{sub 0.92}Ca{sub 0.08}As thin film was grown on Al{sub 2}O{sub 3}(0001) substrate by molecular beam epitaxy. The Curie temperature (T{sub C}) around 340 K was enhanced with the addition of Ca, compared to that of bulk MnAs (T{sub C} ∼ 318 K). The maxima magnetoresistance, ∼2.08% at 0.7 T, was observed near the critical magnetic transition temperature. Moreover, the giant magnetocaloric effect was found with the maximum magnetic entropy change, ∼200 J/kgK, around 330 K at 5 T.

  16. Photo-induced valence change of the sulfur atom in an L-cysteine thin film grown on a silver metal substrate in a saliva-emulated aqueous solution

    SciTech Connect

    Tsujibayashi, Toru; Azuma, Junpei; Yamamoto, Isamu; Takahashi, Kazutoshi; Kamada, Masao

    2015-04-27

    A thin film of L-cysteine (HSCH{sub 2}CH(NH{sub 2})COOH) is grown on a silver substrate in saliva-emulated aqueous solution. X-ray photoemission spectroscopic measurements have revealed that the sulfur atom shows valence change under IR laser irradiation at 825 nm. The valence change maintains for about a minute at room temperature and more than an hour between 110 and 250 K after stopping the laser irradiation. It is not observed at all at temperatures lower than 110 K. This temperature-dependent behavior indicates that the photo-excited electronic change should be accompanied by a conformational change in the L-cysteine molecule. It is strongly suggested that the reversible valence change of the sulfur atom is applicable to a memory used around room temperature.

  17. Structure and magnetotransport properties of epitaxial nanocomposite La0.67Ca0.33MnO3:SrTiO3 thin films grown by a chemical solution approach

    NASA Astrophysics Data System (ADS)

    Fei, Ling; Zhu, Leyi; Cheng, Xuemei; Wang, Haiyan; Baber, Stacy M.; Hill, Joshua; Lin, Qianglu; Xu, Yun; Deng, Shuguang; Luo, Hongmei

    2012-02-01

    Epitaxial La0.67Ca0.33MnO3:SrTiO3 (LCMO:STO) composite thin films have been grown on single crystal LaAlO3(001) substrates by a cost effective polymer-assisted deposition method. Both x-ray diffraction and high-resolution transmission electron microscopy confirm the growth of epitaxial films with an epitaxial relationship between the films and the substrates as (002)film||(002)sub and [202]film||[202]sub. The transport property measurement shows that the STO phase significantly increases the resistivity and enhances the magnetoresistance (MR) effect of LCMO and moves the metal-insulator transition to lower temperatures. For example, the MR values measured at magnetic fields of 0 and 3 T are -44.6% at 255 K for LCMO, -94.2% at 125 K for LCMO:3% STO, and -99.4% at 100 K for LCMO:5% STO, respectively.

  18. Doping effect on SILAR synthesized crystalline nanostructured Cu-doped ZnO thin films grown on indium tin oxide (ITO) coated glass substrates and its characterization

    NASA Astrophysics Data System (ADS)

    Dhaygude, H. D.; Shinde, S. K.; Velhal, Ninad B.; Takale, M. V.; Fulari, V. J.

    2016-08-01

    In the present study, a novel chemical route is used to synthesize the undoped and Cu-doped ZnO thin films in aqueous solution by successive ionic layer adsorption and reaction (SILAR) method. The synthesized thin films are characterized by x-ray diffractometer (XRD), field emission scanning electron microscopy (FE-SEM), energy dispersive x-ray analysis (EDAX), contact angle goniometer and UV–Vis spectroscopic techniques. XRD study shows that the prepared films are polycrystalline in nature with hexagonal crystal structure. The change in morphology for different doping is observed in the studies of FE-SEM. EDAX spectrum shows that the thin films consist of zinc, copper and oxygen elements. Contact angle goniometer is used to measure the contact angle between a liquid and a solid interface and after detection, the nature of the films is initiated from hydrophobic to hydrophilic. The optical band gap energy for direct allowed transition ranging between 1.60–2.91 eV is observed.

  19. Facile synthesis of a mechanically robust and highly porous NiO film with excellent electrocatalytic activity towards methanol oxidation

    NASA Astrophysics Data System (ADS)

    Wang, Luoyuan; Zhang, Guoge; Liu, Yan; Li, Wenfang; Lu, Wei; Huang, Haitao

    2016-05-01

    Considerable research is being conducted in searching for effective anode catalysts in alkaline direct methanol fuel cells (DMFCs). Although significant progress has been achieved, it is still challenging to prepare non-Pt catalysts with both excellent activity and good durability. Herein, a highly porous NiO film is developed by a facile and fast anodization approach. The anodic NiO film demonstrates a high surface area, large mesopore volume and small crystallite size, leading to facilitated adsorption of reaction species, easy electrolyte penetration and fast reaction kinetics. Furthermore, as anodic NiO is grown in situ on a metallic substrate with strong adhesion strength and good electrical contact, it can be used directly as an anode catalyst for methanol oxidation without the need to add any binder or conducting agent. Such an additive-free approach greatly expedites the catalyst preparation process. The anodic NiO shows lower methanol oxidation potential, higher oxidation current and better catalytic durability than most of the state-of-the-art Ni-based catalysts reported elsewhere. As anodization is a simple, low cost and easily scaled up method, the work described here provides an exciting direction to speed up the practical application of alkaline DMFCs.Considerable research is being conducted in searching for effective anode catalysts in alkaline direct methanol fuel cells (DMFCs). Although significant progress has been achieved, it is still challenging to prepare non-Pt catalysts with both excellent activity and good durability. Herein, a highly porous NiO film is developed by a facile and fast anodization approach. The anodic NiO film demonstrates a high surface area, large mesopore volume and small crystallite size, leading to facilitated adsorption of reaction species, easy electrolyte penetration and fast reaction kinetics. Furthermore, as anodic NiO is grown in situ on a metallic substrate with strong adhesion strength and good electrical contact

  20. Ellipsometric investigation of nitrogen doped diamond thin films grown in microwave CH4/H2/N2 plasma enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Ficek, Mateusz; Sankaran, Kamatchi J.; Ryl, Jacek; Bogdanowicz, Robert; Lin, I.-Nan; Haenen, Ken; Darowicki, Kazimierz

    2016-06-01

    The influence of N2 concentration (1%-8%) in CH4/H2/N2 plasma on structure and optical properties of nitrogen doped diamond (NDD) films was investigated. Thickness, roughness, and optical properties of the NDD films in the VIS-NIR range were investigated on the silicon substrates using spectroscopic ellipsometry. The samples exhibited relatively high refractive index (2.6 ± 0.25 at 550 nm) and extinction coefficient (0.05 ± 0.02 at 550 nm) with a transmittance of 60%. The optical investigation was supported by the molecular and atomic data delivered by Raman studies, bright field transmission electron microscopy imaging, and X-ray photoelectron spectroscopy diagnostics. Those results revealed that while the films grown in CH4/H2 plasma contained micron-sized diamond grains, the films grown using CH4/H2/(4%)N2 plasma exhibited ultranano-sized diamond grains along with n-diamond and i-carbon clusters, which were surrounded by amorphous carbon grain boundaries.

  1. Influences of growth parameters on the film formation of hexagonal boron nitride thin films grown on sapphire substrates by low-pressure chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Umehara, Naoki; Masuda, Atsushi; Shimizu, Takaki; Kuwahara, Iori; Kouno, Tetsuya; Kominami, Hiroko; Hara, Kazuhiko

    2016-05-01

    Hexagonal boron nitride (h-BN) films were grown on c-plane sapphire substrates by low-pressure chemical vapor deposition with BCl3 and NH3 as the boron and nitrogen sources, respectively, and the influences of growth parameters on the film quality were investigated for samples with a thickness of about 1 µm. The dependence of X-ray diffraction on the growth temperature (T g) indicated that the crystalline quality is most improved in the sample grown at 1200 °C, in which the epitaxial relationship of {100}h-BN ∥ {110}sapphire and {001}h-BN ∥ {001}sapphire was confirmed. This condition enhanced lateral growth, resulting in the formation of grains with flat top surfaces. The T g dependence was discussed in relation to the amorphous AlN formed on the substrate surface and the reaction between BCl3 and NH3 in the vapor phase. The correlation between the structural and luminescent properties, which was found from the T g dependence of CL, was also discussed.

  2. Influence of the shape and surface oxidation in the magnetization reversal of thin iron nanowires grown by focused electron beam induced deposition

    PubMed Central

    Córdoba, Rosa; Magén, César; Snoeck, Etienne; Koopmans, Bert

    2015-01-01

    Summary Iron nanostructures grown by focused electron beam induced deposition (FEBID) are promising for applications in magnetic sensing, storage and logic. Such applications require a precise design and determination of the coercive field (H C), which depends on the shape of the nanostructure. In the present work, we have used the Fe2(CO)9 precursor to grow iron nanowires by FEBID in the thickness range from 10 to 45 nm and width range from 50 to 500 nm. These nanowires exhibit an Fe content between 80 and 85%, thus giving a high ferromagnetic signal. Magneto-optical Kerr characterization indicates that H C decreases for increasing thickness and width, providing a route to control the magnetization reversal field through the modification of the nanowire dimensions. Transmission electron microscopy experiments indicate that these wires have a bell-type shape with a surface oxide layer of about 5 nm. Such features are decisive in the actual value of H C as micromagnetic simulations demonstrate. These results will help to make appropriate designs of magnetic nanowires grown by FEBID. PMID:26199835

  3. Influence of the shape and surface oxidation in the magnetization reversal of thin iron nanowires grown by focused electron beam induced deposition.

    PubMed

    Rodríguez, Luis A; Deen, Lorenz; Córdoba, Rosa; Magén, César; Snoeck, Etienne; Koopmans, Bert; De Teresa, José M

    2015-01-01

    Iron nanostructures grown by focused electron beam induced deposition (FEBID) are promising for applications in magnetic sensing, storage and logic. Such applications require a precise design and determination of the coercive field (H C), which depends on the shape of the nanostructure. In the present work, we have used the Fe2(CO)9 precursor to grow iron nanowires by FEBID in the thickness range from 10 to 45 nm and width range from 50 to 500 nm. These nanowires exhibit an Fe content between 80 and 85%, thus giving a high ferromagnetic signal. Magneto-optical Kerr characterization indicates that H C decreases for increasing thickness and width, providing a route to control the magnetization reversal field through the modification of the nanowire dimensions. Transmission electron microscopy experiments indicate that these wires have a bell-type shape with a surface oxide layer of about 5 nm. Such features are decisive in the actual value of H C as micromagnetic simulations demonstrate. These results will help to make appropriate designs of magnetic nanowires grown by FEBID. PMID:26199835

  4. Structural and optical properties of dense vertically aligned ZnO nanorods grown onto silver and gold thin films by galvanic effect with iron contamination

    SciTech Connect

    Scarpellini, D.; Paoloni, S.; Medaglia, P.G.; Pizzoferrato, R.; Orsini, A.; Falconi, C.

    2015-05-15

    Highlights: • ZnO nanorods were grown on Au and Ag films in aqueous solution by galvanic effect. • The method is prone to metal contamination which can influence the ZnO properties. • Iron doping improves the lattice matching between ZnO and the substrate. • Energy levels of point defects are lowered and the light emission is red-shifted. • Galvanic-induced nucleation starts and proceeds continuously during the growth. - Abstract: Dense arrays of vertically aligned ZnO nanorods have been grown onto either silver or gold seedless substrates trough a simple hydrothermal method by exploiting the galvanic effect between the substrate and metallic parts. The nanorods exhibit larger bases and more defined hexagonal shapes, in comparison with standard non-galvanic wet-chemistry synthesis. X-ray diffraction (XRD) shows that the iron contamination, associated with the galvanic contact, significantly improves the in-plane compatibility of ZnO with the Au and Ag cubic lattice. Photoluminescence (PL) measurements indicate that the contamination does not affect the number density of localized defects, but lowers their energy levels uniformly; differently, the band-edge emission is not altered appreciably. Finally, we have found that the ZnO hetero-nucleation by galvanic effect initiates at different times in different sites of the substrate area. Our results can be useful for the fabrication of high performance piezonanodevices comprising high-density metal-to-ZnO nanoscaled junctions without intermediate polycrystalline layers.

  5. Mechanisms of the micro-crack generation in an ultra-thin AlN/GaN superlattice structure grown on Si(110) substrates by metalorganic chemical vapor deposition

    SciTech Connect

    Shen, X. Q. Takahashi, T.; Ide, T.; Shimizu, M.

    2015-09-28

    We investigate the generation mechanisms of micro-cracks (MCs) in an ultra-thin AlN/GaN superlattice (SL) structure grown on Si(110) substrates by metalorganic chemical vapor deposition. The SL is intended to be used as an interlayer (IL) for relaxing tensile stress and obtaining high-quality crack-free GaN grown on Si substrates. It is found that the MCs can be generated by two different mechanisms, where large mismatches of the lattice constant (LC) and the coefficient of thermal expansion (CTE) play key roles in the issue. Different MC configurations (low-density and high-density MCs) are observed, which are considered to be formed during the different growth stages (SL growth and cooling down processes) due to the LC and the CTE effects. In-situ and ex-situ experimental results support the mechanism interpretations of the MCs generation. The mechanism understanding makes it possible to optimize the SL IL structure for growing high-quality crack-free GaN films on Si substrates for optical and electronic device applications.

  6. Mechanisms of the micro-crack generation in an ultra-thin AlN/GaN superlattice structure grown on Si(110) substrates by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Shen, X. Q.; Takahashi, T.; Ide, T.; Shimizu, M.

    2015-09-01

    We investigate the generation mechanisms of micro-cracks (MCs) in an ultra-thin AlN/GaN superlattice (SL) structure grown on Si(110) substrates by metalorganic chemical vapor deposition. The SL is intended to be used as an interlayer (IL) for relaxing tensile stress and obtaining high-quality crack-free GaN grown on Si substrates. It is found that the MCs can be generated by two different mechanisms, where large mismatches of the lattice constant (LC) and the coefficient of thermal expansion (CTE) play key roles in the issue. Different MC configurations (low-density and high-density MCs) are observed, which are considered to be formed during the different growth stages (SL growth and cooling down processes) due to the LC and the CTE effects. In-situ and ex-situ experimental results support the mechanism interpretations of the MCs generation. The mechanism understanding makes it possible to optimize the SL IL structure for growing high-quality crack-free GaN films on Si substrates for optical and electronic device applications.

  7. Epitaxial single-crystal thin films of MnxTi1-xO2-δ grown on (rutile)TiO2 substrates with pulsed laser deposition: Experiment and theory

    SciTech Connect

    Ilton, Eugene S.; Droubay, Timothy C.; Chaka, Anne M.; Kovarik, Libor; Varga, Tamas; Arey, Bruce W.; Kerisit, Sebastien N.

    2015-02-01

    Epitaxial rutile-structured single-crystal MnxTi1-xO2-δ films were synthesized on rutile- (110) and -(001) substrates using pulsed laser deposition. The films were characterized by reflection high-energy electron diffraction (RHEED), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and aberration-corrected transmission electron microscopy (ACTEM). Under the present conditions, 400oC and PO2 = 20 mTorr, single crystal epitaxial thin films were grown for x = 0.13, where x is the nominal average mole fraction of Mn. In fact, arbitrarily thick films could be grown with near invariant Mn/Ti concentration profiles from the substrate/film interface to the film surface. In contrast, at x = 0.25, Mn became enriched towards the surface and a secondary nano-scale phase formed which appeared to maintain the basic rutile structure but with enhanced z-contrast in the tunnels, or tetrahedral interstitial sites. Ab initio thermodynamic calculations provided quantitative estimates for the destabilizing effect of expanding the β-MnO2 lattice parameters to those of TiO2-rutile, the stabilizing effect of diluting Mn with increasing Ti concentration, and competing reaction pathways.

  8. rf plasma oxidation of Ni thin films sputter deposited to generate thin nickel oxide layers

    NASA Astrophysics Data System (ADS)

    Hoey, Megan L.; Carlson, J. B.; Osgood, R. M.; Kimball, B.; Buchwald, W.

    2010-10-01

    Nickel oxide (NiO) layers were formed on silicon (Si) substrates by plasma oxidation of nickel (Ni) film lines. This ultrathin NiO layer acted as a barrier layer to conduction, and was an integral part of a metal-insulator-metal (MIM) diode, completed by depositing gold (Au) on top of the oxide. The electrical and structural properties of the NiO thin film were examined using resistivity calculations, current-voltage (I-V) measurements and cross-sectional transmission electron microscopy (XTEM) imaging. The flow rate of the oxygen gas, chamber pressure, power, and exposure time and their influence on the characteristics of the NiO thin film were studied.

  9. Characterization of Y-Ba-Cu-O thin films and yttria-stabilized zirconia intermediate layers on metal alloys grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Reade, R. P.; Mao, X. L.; Russo, R. E.

    1991-08-01

    The use of an intermediate layer is necessary for the growth of YBaCuO thin films on polycrystalline metallic alloys for tape conductor applications. A pulsed laser deposition process to grow controlled-orientation yttria-stabilized zirconia (YSZ) films as intermediate layers on Haynes Alloy No. 230 was developed and characterized. YBaCuO films deposited on these YSZ-coated substrates are primarily c-axis oriented and superconducting as deposited. The best YBaCuO films grow on (001)-oriented YSZ intermediate layers and have Tc (R = 0) = 86.0 K and Jc about 3000 A/sq cm at 77 K.

  10. IR and electrochemical synthesis and characterization of thin films of PEDOT grown on platinum single crystal electrodes in [EMMIM]Tf2N ionic liquid.

    PubMed

    Sandoval, Andrea P; Suárez-Herrera, Marco F; Feliu, Juan M

    2015-01-01

    Thin films of PEDOT synthesized on platinum single electrodes in contact with the ionic liquid 1-ethyl-2,3-dimethylimidazolium triflimide ([EMMIM]Tf2N) were studied by cyclic voltammetry, chronoamperometry, infrared spectroscopy and atomic force microscopy. It was found that the polymer grows faster on Pt(111) than on Pt(110) or Pt(100) and that the redox reactions associated with the PEDOT p-doping process are much more reversible in [EMMIM]Tf2N than in acetonitrile. Finally, the ion exchange and charge carriers' formation during the p-doping reaction of PEDOT were studied using in situ FTIR spectroscopy. PMID:25815089

  11. IR and electrochemical synthesis and characterization of thin films of PEDOT grown on platinum single crystal electrodes in [EMMIM]Tf2N ionic liquid

    PubMed Central

    Sandoval, Andrea P; Suárez-Herrera, Marco F

    2015-01-01

    Summary Thin films of PEDOT synthesized on platinum single electrodes in contact with the ionic liquid 1-ethyl-2,3-dimethylimidazolium triflimide ([EMMIM]Tf2N) were studied by cyclic voltammetry, chronoamperometry, infrared spectroscopy and atomic force microscopy. It was found that the polymer grows faster on Pt(111) than on Pt(110) or Pt(100) and that the redox reactions associated with the PEDOT p-doping process are much more reversible in [EMMIM]Tf2N than in acetonitrile. Finally, the ion exchange and charge carriers’ formation during the p-doping reaction of PEDOT were studied using in situ FTIR spectroscopy. PMID:25815089

  12. Thin Film Ba(x)Sr(1-x)TiO3 Ku- and K-Band Phase Shifters Grown on MgO Substrates

    NASA Technical Reports Server (NTRS)

    VanKeuls, F. W.; Mueller, C. H.; Miranda, F. A.; Romanofsky, R. R.; Horwitz, J. S.; Chang, W.; Kim, W. J.

    1999-01-01

    We report measurements of gold circuits fabricated on four Ba(x)Sr(1-x)TiO3 films doped with 1% Mn grown on MgO substrates by laser ablation. Low frequency measurements of epsilon(sub r) and tan(delta) on interdigital capacitors are compared with high frequency measurements of phase shift and insertion loss on coupled microstrip phase shifters done on the same films. The variation in temperature of both high and low frequency device parameters is compared. Annealed and unannealed films are compared. Room temperature figures of merit of phase shift per insertion loss of up to 58.4 C/dB at 18 GHz and 400 V dc bias were measured.

  13. Strain Relaxation in Thin Films of La1.85Sr0.15CuO4 Grown by Pulsed Laser Deposition

    NASA Astrophysics Data System (ADS)

    Zaytseva, I.; Cieplak, M. Z.; Abal'Oshev, A.; Berkowski, M.; Domukhovski, V.; Paszkowicz, W.; Shalimov, A.

    2007-01-01

    X-ray diffraction, resistivity, and susceptibility measurements are used to examine the effects of film thickness d (from 17 to 250 nm) on the structural and superconducting properties of La1.85Sr0.15CuO4 films grown by pulsed laser deposition on SrLaAlO4 substrates. For each d the film sgrow with a variable strain, ranging from a large compressive strain in the thinnest films to a negligible or tensile strain in thick films. Our results indicate that the tensile strain is not caused by the off-stoichiometric layer at the substrate-film interface. Instead, it may be caused by the extreme oxygen deficiency in some of the films.

  14. Magnetically Hard Fe3Se4 Embedded in Bi2Se3 Topological Insulator Thin Films Grown by Molecular Beam Epitaxy.

    PubMed

    Vasconcelos, Hugo Menezes do Nascimento; Eddrief, Mahmoud; Zheng, Yunlin; Demaille, Dominique; Hidki, Sarah; Fonda, Emiliano; Novikova, Anastasiia; Fujii, Jun; Torelli, Piero; Salles, Benjamin Rache; Vobornik, Ivana; Panaccione, Giancarlo; de Oliveira, Adilson Jesus Aparecido; Marangolo, Massimiliano; Vidal, Franck

    2016-01-26

    We investigated the structural, magnetic, and electronic properties of Bi2Se3 epilayers containing Fe grown on GaAs(111) by molecular beam epitaxy. It is shown that, in the window of growth parameters leading to Bi2Se3 epilayers with optimized quality, Fe atom clustering leads to the formation of FexSey inclusions. These objects have platelet shape and are embedded within Bi2Se3. Monoclinic Fe3Se4 is identified as the main secondary phase through detailed structural measurements. Due to the presence of the hard ferrimagnetic Fe3Se4 inclusions, the system exhibits a very large coercive field at low temperature and room temperature magnetic ordering. Despite this composite structure and the proximity of a magnetic phase, the surface electronic structure of Bi2Se3 is preserved, as shown by the persistence of a gapless Dirac cone at Γ. PMID:26653134

  15. Quality improvements of ZnxCdyMg1-x-ySe layers grown on InP substrates by a thin ZnCdSe interfacial layer

    NASA Astrophysics Data System (ADS)

    Zeng, L.; Yang, B. X.; Tamargo, M. C.; Snoeks, E.; Zhao, L.

    1998-03-01

    The quality of lattice-matched ZnxCdyMg1-x-ySe epitaxial layers grown on (001) InP substrates with a III-V buffer layer has been improved by initially growing a ZnCdSe interfacial layer (50 Å) at low temperature. The widths of double crystal x-ray rocking curves for ZnxCdyMg1-x-ySe epilayers with band gaps as high as 3.05 eV were reduced to about 70 arcsec. The defect density evaluated from etch pit density and plan-view transmission electron microscopy measurements was reduced by two orders of magnitude, to 106-107cm-2. The photoluminescence band edge emission became more symmetric and slightly narrower. It is proposed that an initial two-dimensional growth mode has been achieved by incorporating such a lattice-matched ZnCdSe layer.

  16. Effect of preparation conditions on the properties of Cu3BiS3 thin films grown by a two - step process

    NASA Astrophysics Data System (ADS)

    Mesa, F.; Gordillo, G.

    2009-05-01

    Cu3BiS3 thin films were prepared on soda-lime glass substrates by co-evaporation of the precursors in a two-step process; for that, the metallic precursors were evaporated from a tungsten boat in presence of elemental sulfur evaporated from a tantalum effusion cell. The films were characterized by spectral transmittance, atomic force microscopy AFM and x-ray diffraction (XRD) measurements to investigate the effect of the growth conditions on the optical, morphological and structural properties. The results revealed that, independently of the deposition conditions, the films grow only in the orthorhombic Cu3BiS3 phase. It was also found that the Cu3BiS3 films present p-type conductivity, a high absorption coefficient (greater than 104 cm-1) and an energy band gap Eg of about 1.41 eV, indicating that this compound has good properties to perform as absorbent layer in thin film solar cells.

  17. Effect of different annealing temperatures on the optical properties of Y3(Al,Ga)5O12:Tb thin films grown by PLD

    NASA Astrophysics Data System (ADS)

    Yousif, A.; Swart, H. C.; Ntwaeaborwa, O. M.

    2014-04-01

    Y3(Al,Ga)5O12:Tb thin films have been prepared on SiO2/Si (1 0 0) substrates by using pulsed laser deposition. The deposited films were annealed in air at 800 °C, 900 °C and 1000 °C. Atomic force microscopy, X-ray diffraction, photoluminescence, X-ray photoelectron spectroscopy and Nano-scanning Auger electron microprobe (NanoSAM) techniques have been applied to characterize these films. The results were compared with those of previously investigated Y3(Al,Ga)5O12:Tb thin films on Si (100) without an oxide (SiO2) layer. No change in photoluminescence (PL) excitation bands as a result of post-annealing was observed. Enhancement of PL intensities was observed as a function of annealing temperatures which was attributed to the improvement in crystallization of the films with an increase in annealing temperature. Annealing caused stress in the films and aggravated cracking occurred. Diffusion occurred, leading to phase changes and changes in stoichiometry. There were regions with enriched Si after annealing at higher temperatures.

  18. The 310 340 nm ultraviolet light emitting diodes grown using a thin GaN interlayer on a high temperature AlN buffer

    NASA Astrophysics Data System (ADS)

    Wang, T.; Lee, K. B.; Bai, J.; Parbrook, P. J.; Ranalli, F.; Wang, Q.; Airey, R. J.; Cullis, A. G.; Zhang, H. X.; Massoubre, D.; Gong, Z.; Watson, I. M.; Gu, E.; Dawson, M. D.

    2008-05-01

    Previously, we reported that a thin GaN interlayer approach has been developed for growth of 340 nm ultraviolet light emitting diodes (UV-LEDs) with significantly improved performance. In this paper, more recent results on the further development of UV-LEDs with shorter wavelengths are reported, and the limitation of the wavelength of the UV-LEDs that can be pushed to, while retaining high device performance using the approach has been investigated. Transmission electron microscopy and device-performance data, including electrical and optical characteristics, indicated that the thin GaN interlayer approach can be effectively employed for growth of UV-LEDs to an emission wavelength approaching at least 300 nm. The approach should be taken into account in growth of UV-LEDs on sapphire substrates, as it provides a simple but effective growth method to achieve UV-LEDs with high performance. This paper also reports that a micro-LED array using the UV-LED wafer has been successfully fabricated, offering versatile micro-structured UV light sources for a wide range of applications.

  19. A study on the structural and mechanical properties of nanocrystalline CuS thin films grown by chemical bath deposition technique

    SciTech Connect

    Mukherjee, Nillohit; Sinha, Arijit; Khan, Gobinda Gopal; Chandra, Debraj; Bhaumik, Asim; Mondal, Anup

    2011-01-15

    We report a chemical route for the deposition of nanocrystalline thin films of CuS, using aqueous solutions of Cu(CH{sub 3}COO){sub 2}, SC(NH{sub 2}){sub 2} and N(CH{sub 2}CH{sub 2}OH){sub 3} [triethanolamine, i.e. TEA] in proper concentrations and ratios. The films were structurally characterized using X-ray diffraction technique (XRD), field emission scanning electron microscopy (FESEM) and optical analysis [both photo luminescence (PL) and ultraviolet-visible (UV-vis)]. Optical studies showed a large blue shift in the band gap energy of the films due to quantum confinement effect exerted by the nanocrystals. From both XRD and FESEM analyses, formation of CuS nanocrystals with sizes within 10-15 nm was evident. A study on the mechanical properties was carried out using nanoindentation and nanoscratch techniques, which showed good mechanical stability and high adherence of the films with the bottom substrate. Such study on the mechanical properties of the CuS thin films is being reported here for the first time. Current-voltage (I-V) measurements were also carried out for the films, which showed p-type conductivity.

  20. Strain evolution of each type of grains in poly-crystalline (Ba,Sr)TiO3 thin films grown by sputtering

    NASA Astrophysics Data System (ADS)

    Park, Woo Young; Park, Min Hyuk; Lee, Jong Ho; Yoon, Jung Ho; Han, Jeong Hwan; Choi, Jung-Hae; Hwang, Cheol Seong

    2012-12-01

    The strain states of [111]-, [110]-, and [002]-oriented grains in poly-crystalline sputtered (Ba,Sr)TiO3 thin films on highly [111]-oriented Pt electrode/Si substrates were carefully examined by X-ray diffraction techniques. Remarkably, [002]-oriented grains respond more while [110]- and [111]-oriented grains do less than the theoretically estimated responses, which is understandable from the arrangement of the TiO6 octahedra with respect to the stress direction. Furthermore, such mechanical responses are completely independent of the degree of crystallization and film thickness. The transition growth temperature between the positive and negative strains was also different depending on the grain orientation. The unstrained lattice parameter for each type of grain was different suggesting that the oxygen vacancy concentration for each type of grain is different, too. The results reveal that polycrystalline (Ba,Sr)TiO3 thin films are not an aggregation of differently oriented grains which simply follow the mechanical behavior of single crystal with different orientations.

  1. A codoping route to realize low resistive and stable p-type conduction in (Li, Ni):ZnO thin films grown by pulsed laser deposition.

    PubMed

    Kumar, E Senthil; Chatterjee, Jyotirmoy; Rama, N; DasGupta, Nandita; Rao, M S Ramachandra

    2011-06-01

    We report on the growth of Li-Ni codoped p-type ZnO thin films using pulsed laser deposition. Two mole percent Li monodoped ZnO film shows highly insulating behavior. However, a spectacular decrease in electrical resistivity, from 3.6 × 10(3) to 0.15 Ω cm, is observed by incorporating 2 mol % of Ni in the Li-doped ZnO film. Moreover, the activation energy drops to 6 meV from 78 meV with Ni incorporation in Li:ZnO lattice. The codoped [ZnO:(Li, Ni)] thin film shows p-type conduction with room temperature hole concentration of 3.2 × 10(17) cm(-3). Photo-Hall measurements show that the Li-Ni codoped p-ZnO film is highly stable even with UV illumination. XPS measurements reveal that most favorable chemical state of Ni is Ni(3+) in (Li, Ni): ZnO. We argue that these Ni(3+) ions act as reactive donors and increase the Li solubility limit. Codoping of Li, with other transitional metal ions (Mn, Co, etc.) in place of Ni could be the key to realize hole-dominated conductivity in ZnO to envisage ZnO-based homoepitaxial devices. PMID:21598966

  2. Electron beam induced coloration and luminescence in layered structure of WO{sub 3} thin films grown by pulsed dc magnetron sputtering

    SciTech Connect

    Karuppasamy, A.; Subrahmanyam, A.

    2007-06-01

    Tungsten oxide thin films have been deposited by pulsed dc magnetron sputtering of tungsten in argon and oxygen atmosphere. The as-deposited WO{sub 3} film is amorphous, highly transparent, and shows a layered structure along the edges. In addition, the optical properties of the as-deposited film show a steplike behavior of extinction coefficient. However, the electron beam irradiation (3.0 keV) of the as-deposited films results in crystallization, coloration (deep blue), and luminescence (intense red emission). The above changes in physical properties are attributed to the extraction of oxygen atoms from the sample and the structural modifications induced by electron bombardment. The present method of coloration and luminescence has a potential for fabricating high-density optical data storage device.

  3. Structural and dielectric properties of Ba0.7Sr0.3TiO3 thin films grown by PLD

    NASA Astrophysics Data System (ADS)

    James, K. K.; Satish, B.; Jayaraj, M. K.

    2014-01-01

    Ferroelectric thin films of Ba0.7Sr0.3TiO3 (BST) were deposited on Si/SiO2/TiO2/Pt (PtSi) substrate by pulsed laser deposition (PLD). Crystalline films with perovskite structure were obtained without post-deposition annealing. Phase purity of the deposited films was confirmed by x-ray diffraction. The lowest value of FWHM obtained for the film deposited at oxygen pressure 5.4×10-4 mbar and substrate temperature 600°C, indicates the high crystallinity of the film. The room temperature dielectric constant at 100 kHz was 85. Butterfly loop, which is the characteristic of ferroelectric materials, was obtained in the regime of -4 to +4V. The leakage current density was nearly 9×10-13 Acm-2.

  4. Structural and dielectric properties of Ba{sub 0.7}Sr{sub 0.3}TiO{sub 3} thin films grown by PLD

    SciTech Connect

    James, K. K.; Satish, B.; Jayaraj, M. K.

    2014-01-28

    Ferroelectric thin films of Ba{sub 0.7}Sr{sub 0.3}TiO{sub 3} (BST) were deposited on Si/SiO{sub 2}/TiO{sub 2}/Pt (PtSi) substrate by pulsed laser deposition (PLD). Crystalline films with perovskite structure were obtained without post-deposition annealing. Phase purity of the deposited films was confirmed by x-ray diffraction. The lowest value of FWHM obtained for the film deposited at oxygen pressure 5.4×10{sup −4} mbar and substrate temperature 600°C, indicates the high crystallinity of the film. The room temperature dielectric constant at 100 kHz was 85. Butterfly loop, which is the characteristic of ferroelectric materials, was obtained in the regime of −4 to +4V. The leakage current density was nearly 9×10{sup −13} Acm{sup −2}.

  5. Characterization of Y-Ba-Cu-O thin films and yttria-stabilized zirconia intermediate layers on metal alloys grown by pulsed laser deposition

    SciTech Connect

    Reade, R.P.; Mao, X.L.; Russo, R.E. )

    1991-08-05

    The use of an intermediate layer is necessary for the growth of YBaCuO thin films on polycrystalline metallic alloys for tape conductor applications. A pulsed laser deposition process to grow controlled-orientation yttria-stabilized zirconia (YSZ) films as intermediate layers on Haynes Alloy No. 230 was developed and characterized. YBaCuO films deposited on these YSZ-coated substrates are primarily {ital c}-axis oriented and superconducting as deposited. The best YBaCuO films grow on (001) oriented YSZ intermediate layers and have {ital T}{sub {ital c}} ({ital R}=0) = 86.0 K and {ital J}{sub {ital c}} {similar to} 3{times}10{sup 3} A/cm{sup 2} at 77 K.

  6. Transport properties of ultra-thin VO2 films on (001) TiO2 grown by reactive molecular-beam epitaxy

    NASA Astrophysics Data System (ADS)

    Paik, Hanjong; Moyer, Jarrett A.; Spila, Timothy; Tashman, Joshua W.; Mundy, Julia A.; Freeman, Eugene; Shukla, Nikhil; Lapano, Jason M.; Engel-Herbert, Roman; Zander, Willi; Schubert, Jürgen; Muller, David A.; Datta, Suman; Schiffer, Peter; Schlom, Darrell G.

    2015-10-01

    We report the growth of (001)-oriented VO2 films as thin as 1.5 nm with abrupt and reproducible metal-insulator transitions (MIT) without a capping layer. Limitations to the growth of thinner films with sharp MITs are discussed, including the Volmer-Weber type growth mode due to the high energy of the (001) VO2 surface. Another key limitation is interdiffusion with the (001) TiO2 substrate, which we quantify using low angle annular dark field scanning transmission electron microscopy in conjunction with electron energy loss spectroscopy. We find that controlling island coalescence on the (001) surface and minimization of cation interdiffusion by using a low growth temperature followed by a brief anneal at higher temperature are crucial for realizing ultrathin VO2 films with abrupt MIT behavior.

  7. Distinctions of the growth and structural-spectroscopic investigations of thin AlN films grown on the GaAs substrates

    NASA Astrophysics Data System (ADS)

    Seredin, P. V.; Kashkarov, V. M.; Arsentyev, I. N.; Bondarev, A. D.; Tarasov, I. S.

    2016-08-01

    Using X-ray diffraction analysis, atomic force microscopy, IR and UV spectroscopy, the properties of thin aluminium nitride films (<200 nm) that were obtained by ion-plasma reactive sputtering on GaAs substrates with different orientations were studied. The films of aluminium nitride can have a refractive index within the range of 1.6-4.0 for the wavelength band around ~250 nm and an optical band-gap of ~5 eV. It was shown that the morphology, surface composition and optical functional characteristics of AlN/GaAs heterophase systems can be controlled owing to the use of misoriented GaAs substrates as well choice of the technological parameters used for the film growth.

  8. Structural, magnetic, and electronic properties of GdTiO{sub 3} Mott insulator thin films grown by pulsed laser deposition

    SciTech Connect

    Grisolia, M. N.; Bruno, F. Y.; Sando, D.; Jacquet, E.; Barthélémy, A.; Bibes, M.; Zhao, H. J.; Chen, X. M.; Bellaiche, L.

    2014-10-27

    We report on the optimization process to synthesize epitaxial thin films of GdTiO{sub 3} on SrLaGaO{sub 4} substrates by pulsed laser deposition. Optimized films are free of impurity phases and are fully strained. They possess a magnetic Curie temperature T{sub C} = 31.8 K with a saturation magnetization of 4.2 μ{sub B} per formula unit at 10 K. Transport measurements reveal an insulating response, as expected. Optical spectroscopy indicates a band gap of ∼0.7 eV, comparable to the bulk value. Our work adds ferrimagnetic orthotitanates to the palette of perovskite materials for the design of emergent strongly correlated states at oxide interfaces using a versatile growth technique such as pulsed laser deposition.

  9. Superior dielectric properties for template assisted grown (100) oriented Gd{sub 2}O{sub 3} thin films on Si(100)

    SciTech Connect

    Roy Chaudhuri, Ayan Osten, H. J.; Fissel, A.

    2014-01-06

    We report about the single crystalline growth and dielectric properties of Gd{sub 2}O{sub 3}(100) thin films on Si(100) surface. Using a two step molecular beam epitaxy growth process, we demonstrate that controlled engineering of the oxide/Si interface is a key step to achieve the atypical (100) oriented growth of Gd{sub 2}O{sub 3}. Unusually, high dielectric constant values (∼23–27) were extracted from capacitance voltage measurements. Such effect can be understood in terms of a two dimensional charge layer at the Gd{sub 2}O{sub 3}/Si interface (W. Sitaputra and R. Tsu, Appl. Phys. Lett. 101, 222903 (2012)) which can influence the dielectric properties of the oxide layer by forming an additional negative quantum capacitance.

  10. Sapphire substrate-induced effects in VO{sub 2} thin films grown by oxygen plasma-assisted pulsed laser deposition

    SciTech Connect

    Skuza, J. R. E-mail: apradhan@nsu.edu; Scott, D. W.; Pradhan, A. K. E-mail: apradhan@nsu.edu

    2015-11-21

    We investigate the structural and electronic properties of VO{sub 2} thin films on c-plane sapphire substrates with three different surface morphologies to control the strain at the substrate-film interface. Only non-annealed substrates with no discernible surface features (terraces) provided a suitable template for VO{sub 2} film growth with a semiconductor-metal transition (SMT), which was much lower than the bulk transition temperature. In addition to strain, oxygen vacancy concentration also affects the properties of VO{sub 2}, which can be controlled through deposition conditions. Oxygen plasma-assisted pulsed laser deposition allows favorable conditions for VO{sub 2} film growth with SMTs that can be easily tailored for device applications.

  11. Electronic excitations and structure of Li{sub 2}IrO{sub 3} thin films grown on ZrO{sub 2}:Y (001) substrates

    SciTech Connect

    Jenderka, Marcus Schmidt-Grund, Rüdiger; Grundmann, Marius; Lorenz, Michael

    2015-01-14

    Thin films are a prerequisite for application of the emergent exotic ground states in iridates that result from the interplay of strong spin-orbit coupling and electronic correlations. We report on pulsed laser deposition of Li{sub 2}IrO{sub 3} films on ZrO{sub 2}:Y (001) single crystalline substrates. X-ray diffraction confirms preferential (001) and (10-1) out-of-plane crystalline orientations with well defined in-plane orientation. Resistivity between 35 and 300 K is dominated by a three-dimensional variable range hopping mechanism. The dielectric function is determined by means of spectroscopic ellipsometry and, complemented by Fourier transform infrared transmission spectroscopy, reveals a small optical gap of ≈300 meV, a splitting of the 5d-t{sub 2g} manifold, and several in-gap excitations attributed to phonons and possibly magnons.

  12. Intrinsic defect-mediated conduction and resistive switching in multiferroic BiFeO3 thin films epitaxially grown on SrRuO3 bottom electrodes

    NASA Astrophysics Data System (ADS)

    Lee, Ji Hye; Jeon, Ji Hoon; Yoon, Chansoo; Lee, Sangik; Kim, Yeon Soo; Oh, Tae Joon; Kim, Young Heon; Park, Jinsu; Song, Tae Kwon; Park, Bae Ho

    2016-03-01

    We report the impact of intrinsic defects in epitaxial BiFeO3 films on charge conduction and resistive switching of Pt/BiFeO3/SrRuO3 capacitors, although the BiFeO3 films show very similar ferroelectric domain types probed by piezoresponse force microscopy. Capacitors with p-type Bi-deficient and n-type Bi-rich BiFeO3 films exhibit switchable diode and conventional bipolar resistive switching behaviors, respectively. Both the capacitors show good retention properties with a high ON/OFF ratio of >100 in Bi-deficient films and that of >1000 in Bi-rich films. The present investigation advances considerably understanding of interface control through defect engineering of BiFeO3 thin films for non-volatile memory application.

  13. Electronic and crystalline structures of zero band-gap LuPdBi thin films grown epitaxially on MgO(100)

    SciTech Connect

    Shan, Rong; Ouardi, Siham; Fecher, Gerhard H.; ViolBarbosa, Carlos E.; Felser, Claudia; Gao, Li; Kellock, Andrew; Roche, Kevin P.; Samant, Mahesh G.; Parkin, Stuart S. P.; Ikenaga, Eiji

    2013-04-29

    Thin films of the proposed topological insulator LuPdBi-a Heusler compound with the C1{sub b} structure-were prepared on Ta-Mo-buffered MgO(100) substrates by co-sputtering from PdBi{sub 2} and Lu targets. Epitaxial growth of LuPdBi films was confirmed by X-ray diffraction and reflection high-energy electron diffraction. The root-mean-square roughness of the films was as low as 1.45 nm, even though the films were deposited at high temperature. The film composition is close to the ideal stoichiometric ratio. The valence band spectra of the LuPdBi films, observed by hard X-ray photoelectron spectroscopy, correspond very well with the ab initio-calculated density of states.

  14. Substrate-induced disorder in V{sub 2}O{sub 3} thin films grown on annealed c-plane sapphire substrates

    SciTech Connect

    Brockman, J.; Samant, M. G.; Roche, K. P.; Parkin, S. S. P.

    2012-07-30

    We investigate the structural and electronic properties of V{sub 2}O{sub 3} thin films deposited by oxygen plasma-assisted molecular beam epitaxy onto annealed and unannealed c-plane sapphire substrates. Annealing the substrates before growth to produce ultra-smooth surfaces improved initial epitaxy, according to in situ reflection high-energy electron diffraction. Surprisingly, films deposited on annealed substrates had a more island-like surface, broader x-ray diffraction peaks, and an increased resistivity of V{sub 2}O{sub 3}'s normally metallic high-temperature phase. We attribute these results to enhanced strain coupling at the interface between the substrate and film, highlighting the vulnerability of V{sub 2}O{sub 3}'s strongly correlated metallic phase to crystalline defects and structural disorder.

  15. Transport properties of ultra-thin VO{sub 2} films on (001) TiO{sub 2} grown by reactive molecular-beam epitaxy

    SciTech Connect

    Paik, Hanjong; Tashman, Joshua W.; Moyer, Jarrett A.; Schiffer, Peter; Spila, Timothy; Mundy, Julia A.; Freeman, Eugene; Shukla, Nikhil; Datta, Suman; Lapano, Jason M.; Engel-Herbert, Roman; Zander, Willi; Schubert, Jürgen; Muller, David A.; Schlom, Darrell G.

    2015-10-19

    We report the growth of (001)-oriented VO{sub 2} films as thin as 1.5 nm with abrupt and reproducible metal-insulator transitions (MIT) without a capping layer. Limitations to the growth of thinner films with sharp MITs are discussed, including the Volmer-Weber type growth mode due to the high energy of the (001) VO{sub 2} surface. Another key limitation is interdiffusion with the (001) TiO{sub 2} substrate, which we quantify using low angle annular dark field scanning transmission electron microscopy in conjunction with electron energy loss spectroscopy. We find that controlling island coalescence on the (001) surface and minimization of cation interdiffusion by using a low growth temperature followed by a brief anneal at higher temperature are crucial for realizing ultrathin VO{sub 2} films with abrupt MIT behavior.

  16. Structural properties of relaxed thin film germanium layers grown by low temperature RF-PECVD epitaxy on Si and Ge (100) substrates

    SciTech Connect

    Cariou, R.; Ruggeri, R.; Tan, X.; Nassar, J.; Roca i Cabarrocas, P.; Mannino, Giovanni

    2014-07-15

    We report on unusual low temperature (175 °C) heteroepitaxial growth of germanium thin films using a standard radio-frequency plasma process. Spectroscopic ellipsometry and transmission electron microscopy (TEM) reveal a perfect crystalline quality of epitaxial germanium layers on (100) c-Ge wafers. In addition direct germanium crystal growth is achieved on (100) c-Si, despite 4.2% lattice mismatch. Defects rising from Ge/Si interface are mostly located within the first tens of nanometers, and threading dislocation density (TDD) values as low as 10{sup 6} cm{sup −2} are obtained. Misfit stress is released fast: residual strain of −0.4% is calculated from Moiré pattern analysis. Moreover we demonstrate a striking feature of low temperature plasma epitaxy, namely the fact that crystalline quality improves with thickness without epitaxy breakdown, as shown by TEM and depth profiling of surface TDD.

  17. Deposition and characterization of Cd{sub 1−x}Mg{sub x}Te thin films grown by a novel cosublimation method

    SciTech Connect

    Kobyakov, Pavel S. Swanson, Drew E.; Sampath, Walajabad S.; Moore, Andrew; Raguse, John M.

    2014-03-15

    Photovoltaic cells utilizing the CdS/CdTe structure have improved substantially in the past few years. Despite the recent advances, the efficiency of CdS/CdTe cells is still significantly below their Shockley–Queisser limit. CdTe based ternary alloy thin films, such as Cd{sub 1−x}Mg{sub x}Te (CMT), could be used to improve efficiency of CdS/CdTe photovoltaic cells. Higher band gap Cd{sub 1−x}Mg{sub x}Te films can be the absorber in top cells of a tandem structure or an electron reflector layer in CdS/CdTe cells. A novel cosublimation method to deposit CMT thin films has been developed. This method can deposit CMT films of band gaps ranging from 1.5 to 2.3 eV. The cosublimation method is fast, repeatable, and scalable for large areas, making it suitable for implementing into large-scale manufacturing. Characterization of as-deposited CMT films, with x varying from 0 to 0.35, reveals a linear relationship between Mg content measured by energy dispersive x-ray spectroscopy and the optical band gap. Glancing angle x-ray diffraction (GAXRD) measurements of Cd{sub 1−x}Mg{sub x}Te films show a zinc-blende structure similar to CdTe. Furthermore, increasing Mg content decreases the lattice parameter and the grain size. GAXRD shows the films are under mild tension after deposition.

  18. Linear surface smoothening of (Ti{sub 0.48}Al{sub 0.52})N thin films grown on rough substrates

    SciTech Connect

    Liu, Z.-J.; Shum, P.W.; Shen, Y.G.

    2005-06-20

    The evolution of surface roughness during the growth of sputter-deposited solid solution (Ti{sub 0.48}Al{sub 0.52})N films on rough high-speed-steel (HSS) substrates has been studied by atomic force microscopy. It has been revealed that the growing (Ti{sub 0.48}Al{sub 0.52})N/HSS film experiences a continuous surface smoothening. Scaling analyses along with surface power spectra calculation of the (Ti{sub 0.48}Al{sub 0.52})N films grown on smooth Si(100) substrates under the same deposition conditions indicate that this surface smoothening is linear and can be explained by a simple linear equation with surface diffusion as the smoothening mechanism and shot noise as the roughening effect. The observed linear surface smoothening in (Ti{sub 0.48}Al{sub 0.52})N/HSS films has also been confirmed by our numerical simulations of the film growth using real HSS and Si(100) substrates as their initial growth conditions and can be understood in terms of the competition between the surface-diffusion-induced decrease in substrate roughness contribution and the noise-driven roughening effect.

  19. Effect of wettability on surface morphologies and optical properties of Ag thin films grown on glass and polymer substrates by thermal evaporation

    NASA Astrophysics Data System (ADS)

    Lv, Jing

    2013-05-01

    A series of Ag films with different thicknesses were deposited on BK-7 glass, PET and PC substrates under identical conditions by thermal evaporation. The effect of the wettability on the morphology and optical properties of Ag/glass and Ag/polymer films was studied by atomic force microscopy and spectrophotometry. The experimental results show that the wettability of Ag grains with polymer is stronger than with glass, which results in the aggregation of bigger grains in initial layer. During deposition the interaction of interlayer plays an important role for the formation of the surface morphology. The strong wettability activates the nonlinear optical properties of Ag grains grown on polymer substrates, which result in the strong absorbance in short wavelength. The effect of the bare substrate on the transmittance of Ag films is more obvious than the reflectance. With the increasing of the thickness, the effect of the wettability on the morphology and optical properties of Ag films decline. In this experiment when the thickness is above 50 nm, the effect almost vanished.

  20. Surface segregation as a means of gettering Cu in liquid-phase-epitaxy silicon thin layers grown from Al-Cu-Si solutions

    SciTech Connect

    Wang, T.H.; Ciszek, T.F.; Reedy, R.; Asher, S.; King, D.

    1996-05-01

    The authors demonstrate that, by using the natural surface segregation phenomenon, Cu can be gettered to the surface from the bulk of silicon layers so that its concentrations in the liquid-phase-epitaxy (LPE) layers are much lower than its solubility at the layer growth temperature and the reported 10{sup 17} cm{sup {minus}3} degradation threshold for solar-cell performance. Secondary-ion mass spectroscopy (SIMS) analysis indicates that, within a micron-deep sub-surface region, Cu accumulates even in as-grown LPE samples. Slower cooling after growth to room temperature enhances this Cu enrichment. X-ray photoelectron spectroscopy (XPS) measurement shows as much as 3.2% Cu in a surface region of about 50 {Angstrom}. More surface-sensitive, ion-scattering spectroscopy (ISS) analysis further reveals about 7% of Cu at the top surface. These results translate to an areal gettering capacity of about 1.0 x 10{sup 16} cm{sup {minus}2}, which is higher than the available total-area density of Cu in the layer and substrate (3.6 x 10{sup 15} cm{sup {minus}2} for a uniform 1.2 x 10{sup 17}cm{sup {minus}3} Cu throughout the layer and substrate with a total thickness of 300 {mu}m).

  1. Comprehensive strain and band gap analysis of PA-MBE grown AlGaN/GaN heterostructures on sapphire with ultra thin buffer

    SciTech Connect

    Mahata, Mihir Kumar; Ghosh, Saptarsi; Jana, Sanjay Kumar; Bag, Ankush; Kumar, Rahul; Chakraborty, Apurba; Biswas, Dhrubes; Mukhopadhyay, Partha

    2014-11-15

    In this work, cluster tool (CT) Plasma Assisted Molecular Beam Epitaxy (PA-MBE) grown AlGaN/GaN heterostructure on c-plane (0 0 0 1) sapphire (Al{sub 2}O{sub 3}) were investigated by High Resolution X-ray Diffraction (HRXRD), Room Temperature Raman Spectroscopy (RTRS), and Room Temperature Photoluminescence (RTPL). The effects of strain and doping on GaN and AlGaN layers were investigated thoroughly. The out-of-plane (‘c’) and in-plane (‘a’) lattice parameters were measured from RTRS analysis and as well as reciprocal space mapping (RSM) from HRXRD scan of (002) and (105) plane. The in-plane (out-of plane) strain of the samples were found to be −2.5 × 10{sup −3}(1 × 10{sup −3}), and −1.7 × 10{sup −3}(2 × 10{sup −3}) in GaN layer and 5.1 × 10{sup −3} (−3.3 × 10{sup −3}), and 8.8 × 10{sup −3}(−1.3 × 10{sup −3}) in AlGaN layer, respectively. In addition, the band structures of AlGaN/GaN interface were estimated by both theoretical (based on elastic theory) and experimental observations of the RTPL spectrum.

  2. Transport properties of SrTiO3-δ thin films grown by Molecular Beam Epitaxy on p-Si(001) substrates

    NASA Astrophysics Data System (ADS)

    Theodoropoulou, Nikoleta; Currie, Daniel; Cottier, Ryan; Ponce-Pedraza, Arturo; Cantu, Jesus; Villarreal, Oscar

    2015-03-01

    SrTiO3 (STO) films were grown on p-Si(001) and STO(001) bulk substrates using molecular beam epitaxy (MBE). Oxygen vacancies were introduced by controlling the Oxygen pressure during growth (P(O2) : 4 × 10-8 - 8 × 10-7) resulting in SrTiO3-δ with δ ~ 0.02% for the lowest P(O2) . The single-phase STO/Si films were of high crystalline quality as verified by x-ray diffraction, transmission electron microscopy, and atomically flat. Transport measurements were performed on the STO/Si structures in a Van der Pauw configuration. The P(O2) during growth determines the conduction behavior which changes from strongly localized transport that fits a Variable Range Hopping (VRH) model (low P(O2) -high disorder) to thermally activated transport (high P(O2) -low disorder). The resistivity of the strongly disordered STO/Si films decreased from 1 Ohm .cm to 3x10-2 Ohm .cm as the film thickness increased (3nm-60nm). The perpendicular magnetoresistance (MR) is positive at 300K and becomes negative at T =3-20K. We consider competing effects on the STO/Si heterostructure such as 1.7% compressive strain induced by lattice mismatch to Si, defects due to oxygen vacancies, the bulk STO antiferrodistortive phase transition at 105K, and structural dislocations. Funded by NSF Career Award DMR-1255629.

  3. Aluminum doped nickel oxide thin film with improved electrochromic performance from layered double hydroxides precursor in situ pyrolytic route

    NASA Astrophysics Data System (ADS)

    Shi, Jingjing; Lai, Lincong; Zhang, Ping; Li, Hailong; Qin, Yumei; Gao, Yuanchunxue; Luo, Lei; Lu, Jun

    2016-09-01

    Electrochromic materials with unique performance arouse great interest on account of potential application values in smart window, low-power display, automobile anti-glare rearview mirror, and e-papers. In this paper, high-performing Al-doped NiO porous electrochromic film grown on ITO substrate has been prepared via a layered double hydroxides(LDHs) precursor in situ pyrolytic route. The Al3+ ions distributed homogenously within the NiO matrix can significantly influence the crystallinity of Ni-Al LDH and NiO:Al3+ films. The electrochromic performance of the films were evaluated by means of UV-vis absorption spectroscopy, cyclic voltammetry (CV), electrochemical impedance spectroscopy (EIS), and chronoamperometry(CA) measurements. In addition, the ratio of Ni3+/Ni2+ also varies with Al content which can lead to different electrochemical performances. Among the as-prepared films, NiO film prepared from Ni-Al (19:1) LDH show the best electrochromic performance with a high transparency of 96%, large optical modulation range (58.4%), fast switching speed (bleaching/coloration times are 1.8/4.2 s, respectively) and excellent durability (30% decrease after 2000 cycles). The improved performance was owed to the synergy of large NiO film specific surface area and porous morphology, as well as Al doping stifled the formation of Ni3+ making bleached state more pure. This LDHs precursor pyrolytic method is simple, low-cost and environmental benign and is feasible for the preparation of NiO:Al and other Al-doped oxide thin film.

  4. Effect of Ga{sup +} irradiation in molecular-beam epitaxy grown Pt/Co/Pt thin films studied by magneto-optic spectroscopy

    SciTech Connect

    Jakubisova-Liskova, E. Visnovsky, S.; Wawro, A.; Baczewski, L. T.; Liedke, M. O.; McCord, J.; Fassbender, J.

    2014-05-07

    In-depth profile changes induced by Ga{sup +} ion irradiation in Pt(5 nm)/Co(3.3 nm)/Pt(20 nm)/Mo(20 nm) sandwiches MBE grown on Al{sub 2}O{sub 3} substrates are deduced from complex magneto-optic polar Kerr effect (PMOKE) measurements at photon energies between 1 and 5 eV. The Ga{sup +} irradiation stimulates a redistribution of Pt and Co and leads to broadening of alloyed regions at Pt-Co and Co-Pt interfaces, which is evaluated using PMOKE spectra. The effect of four Ga{sup +} fluences D between zero and 6 × 10{sup 15} Ga{sup +}/cm{sup 2} was studied. The observed PMOKE azimuth rotation peak centered at 4.5 eV reaches the maximum of 0.42° at D = 1 × 10{sup 15} Ga{sup +}/cm{sup 2} and becomes thus enhanced by a factor of 3.2 with respect to that in the non-irradiated sample. At D = 6 × 10{sup 15} Ga{sup +}/cm{sup 2} the peak amplitude falls to 0.05°. To find the in-depth profile of Co concentration s in the sandwiches as a function of D, the PMOKE azimuth rotation and ellipticity spectra are compared with a multilayer model, where ideal flat interfaces are replaced by sequences of Co{sub s}Pt{sub 1−s} layers. The dependence on D is compared with that evaluated by simulations of the structural effects of ion irradiation. At the highest D, the irradiation produces an almost complete erosion of the top Pt and Co accompanied by mixing at the Pt-Mo interface.

  5. Structural and dynamical magnetic response of co-sputtered Co2FeAl heusler alloy thin films grown at different substrate temperatures

    NASA Astrophysics Data System (ADS)

    Yadav, Anjali; Chaudhary, Sujeet

    2014-04-01

    The interdependence between the dynamical magnetic response and the microstructural properties such as crystallinity, lateral crystallite size, structural ordering of the co-sputtered polycrystalline Co2FeAl thin films on Si (100) are studied by varying the growth temperature from room temperature (RT) to 600 °C. Frequency (7-11 GHz) dependent in-plane ferromagnetic resonance (FMR) studies were carried out by using co-planar waveguide to estimate Gilbert damping constant (α) and effective saturation magnetization (4πMeff). The improvement in crystallinity, larger crystallite and particle sizes of the films are critical in obtaining films with lower α and higher 4πMeff. Increase in the lattice constant with substrate temperature indicates the improvement in the structural ordering at higher temperatures. Minimum value of α is found to be 0.005 ± 0.0003 for the film deposited at 500 °C, which is comparable to the values reported for epitaxial Co2FeAl films. The value of 4πMeff is found to increase from 1.32 to 1.51 T with the increase in deposition temperature from RT to 500 °C. The study also shows that the root mean square (rms) roughness linearly affects the FMR in-homogenous line broadening and the anisotropy field.

  6. Strain-Dependence of the Structure and Ferroic Properties of Epitaxial NiTiO 3 Thin Films Grown on Different Substrates

    DOE PAGESBeta

    Varga, Tamas; Droubay, Timothy C.; Bowden, Mark E.; Kovarik, Libor; Hu, Dehong; Chambers, Scott A.

    2015-01-01

    Polarization-induced weak ferromagnetism has been predicted a few years back in perovskite MTiO 3 (M = Fe, Mn, and Ni). We set out to stabilize this metastable perovskite structure by growing NiTiO 3 epitaxially on different substrates and to investigate the dependence of polar and magnetic properties on strain. Epitaxial NiTiO 3 films were deposited on Al 2 O 3 , Fe 2 O 3 , and LiNbO 3 substrates by pulsed laser deposition and characterized using several techniques. The effect of substrate choice on lattice strain, film structure, and physical properties was investigated. Our structural data from X-raymore » diffraction and electron microscopy shows that substrate-induced strain has a marked effect on the structure and crystalline quality of the films. Physical property measurements reveal a dependence of the weak ferromagnetism and lattice polarization on strain and highlight our ability to control the ferroic properties in NiTiO 3 thin films by the choice of substrate. Our results are also consistent with the theoretical prediction that the ferromagnetism in acentric NiTiO 3 is polarization induced. From the substrates studied here, the perovskite substrate LiNbO 3 proved to be the most promising one for strong multiferroism.« less

  7. The evolution of catalyst layer morphology and sub-surface growth of CNTs over the hot filament grown Fe-Cr thin films

    NASA Astrophysics Data System (ADS)

    Pasha, M. Akbarzadeh; Ranjbar, M.; Vesaghi, M. A.; Shafiekhani, A.

    2010-12-01

    In this study a hot filament chemical vapour deposition (HFCVD) technique was used to prepare Fe-Cr films on Si substrate as catalysts for thermal CVD (TCVD) growing of carbon nanotubes (CNTs) from liquid petroleum gas (LPG) at 800 °C. To characterize the catalysts or CNTs, X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and Raman spectroscopy were used. The XPS spectra obtained at different stages of Ar + sputtering revealed that in the depth of catalyst layers, the relative Fe-Cr concentrations are higher than the top-surface. SEM images of samples after TCVD indicate a significant CNT growing at the backside of catalyst layer compared with its top which is accompanied with morphological changes on catalyst layer such as formation of cone-shape structures, rippling, cracking and rolling of the layer. These observations were attributed to the more catalytic activity of the sub-surface beside the poor activity of the top-surface as well as the presence of individual active islands over the surface of the catalyst thin film.

  8. Growth parameters effect on the thermoelectric characteristics of Bi 2Se 3 thin films grown by MOCVD system using Ditertiarybutylselenide as a precursor

    NASA Astrophysics Data System (ADS)

    Bayaz, A. Al; Giani, A.; Khalfioui, M. Al; Foucaran, A.; Pascal-Delannoy, F.; Boyer, A.

    2003-10-01

    The growth of Bi 2Se 3 thin films by metalorganic chemical vapour deposition (MOCVD) using Trimethylbismuth (TMBi) and a novel Se-precursor: Ditertiarybutylselenide (DTBSe) as bismuth and selenium sources, respectively, is investigated on pyrex substrates. The effect of the growth parameters such as substrate temperature, Tg, and TMBi partial pressure, PTMBi, on the structural, electrical and thermoelectrical properties for the following growth conditions: 440°C⩽ Tg⩽475°C, 0.5×10 -4 atm⩽ PTMBi⩽1×10 -4 atm and a total hydrogen flow rate DT=3 l/mn, of Bi 2Se 3 films has been investigated. The crystallinity versus growth condition ( Tg, PTMBi) using X-ray diffraction was studied and a typical preferential c-orientation was observed. Thus, these layers always displayed n-type conduction using Hall effect measurement. The best electric and thermoelectric characteristics under the optimal growth conditions have been found; μ>250 cm 2/V s, ρ⩽11.8 μΩ m and α=-163.7 μV/K Then, These initial results suggest a significant potential for the MOCVD method to produce good thermoelectrical materials using DTBSe as Se-precursor.

  9. Process optimization of deposition conditions of PbS thin films grown by a successive ionic layer adsorption and reaction (SILAR) method using response surface methodology

    NASA Astrophysics Data System (ADS)

    Yücel, Ersin; Yücel, Yasin; Beleli, Buse

    2015-07-01

    In this study, lead sulfide (PbS) thin films were synthesized by a successive ionic layer adsorption and reaction (SILAR) method with different pH, dipping time and dipping cycles. Response surface methodology (RSM) and central composite design (CCD) were successfully used to optimize the PbS films deposition parameters and understand the significance and interaction of the factors affecting the film quality. 5-level-3-factor central composite design was employed to evaluate the effects of the deposition parameters (pH, dipping time and dipping cycles) on the response (the optical band gap of the films). Data obtained from RSM were subjected to the analysis of variance (ANOVA) and analyzed using a second order polynomial equation. The optimal conditions for the PbS films deposition have been found to be: pH of 9.1, dipping time of 10 s and dipping cycles of 10 cycles. The predicted band gap of PbS film was 2.13 eV under the optimal conditions. Verification experiment (2.24 eV) confirmed the validity of the predicted model. The film structures were characterized by X-ray diffractometer (XRD). Morphological properties of the films were studied with a scanning electron microscopy (SEM). The optical properties of the films were investigated using a UV-visible spectrophotometer.

  10. Influence of annealing temperature on photoluminescence properties and optical constants of N-doped ZnO thin films grown on muscovite mica substrates

    NASA Astrophysics Data System (ADS)

    Kim, Younggyu; Leem, Jae-Young

    2015-11-01

    A sol-gel spin-coating method was used to synthesize N-doped ZnO (NZO) thin films on muscovite mica substrates; the films were then annealed at 200, 300, 400, and 500 °C. The effects of the annealing temperature on their photoluminescence properties and optical constants were investigated. All the films had strong UV emissions in their photoluminescence spectra, but the green emissions at ~2.4 eV were observed only for the annealed films. The average transmittance of all the films was about 80% in the visible range and the absorption edges in the UV range at 375 nm depended strongly on the annealing temperature. The optical band gap of the films decreased gradually as the annealing temperature was increased up to 400 °C, and the Urbach energy decreased significantly as the annealing temperature increased. Finally, the various optical constants, the dielectric constant, and the optical conductivity were measured for the un-annealed film and the film annealed at 500 °C.

  11. Photovoltaic properties of Aurivillius phase Bi{sub 5}FeTi{sub 3}O{sub 15} thin films grown by pulsed laser deposition

    SciTech Connect

    Kooriyattil, Sudheendran; Katiyar, Rajesh K.; Pavunny, Shojan P. E-mail: shojanpp@gmail.com; Morell, Gerardo; Katiyar, Ram S. E-mail: shojanpp@gmail.com

    2014-08-18

    We report a remarkable photovoltaic effect in pulsed laser deposited multiferroic aurivillius phase Bi{sub 5}FeTi{sub 3}O{sub 15} (BFTO) thin films sandwiched between ZnO:Al transparent conductive oxide top electrode and SrRuO{sub 3} bottom electrode fabricated on amorphous fused silica substrates. The structural and micro structural properties of these films were analysed by X-ray diffraction and atomic force microscopy techniques. The films were showing a photo sensitive ferroelectric behaviour with a notable apparent polarization in the range of 10–15 μC/cm{sup 2}. These films also exhibited a switchable photo-response and this parameter was observed to be sensitive to polarisation field and the polarization direction. The device shows a large ON/OFF photo current ratio with an open circuit voltage of 0.14 V. The photo response at zero bias of this BFTO based heterostructures showed rapid increase to a saturation value of 6 μA at zero bias.

  12. Strain-dependence Of The Structure And Ferroic Properties Of Epitaxial NiTiO3 Thin Films Grown On Different Substrates

    SciTech Connect

    Varga, Tamas; Droubay, Timothy C.; Bowden, Mark E.; Kovarik, Libor; Hu, Dehong; Chambers, Scott A.

    2015-08-14

    Polarization-induced weak ferromagnetism has been predicted a few years back in perovskite MTiO3 (M = Fe, Mn, Ni) [Fennie, Phys. Rev. Lett. 100, 167203 (2008)]. We set out to stabilize this metastable perovskite structure by growing NiTiO3 epitaxially on different substrates, and to investigate the dependence of polar and magnetic properties on strain. Epitaxial NiTiO3 films were deposited on Al2O3, Fe2O3, and LiNbO3 substrates by pulsed laser deposition, and characterized using several techniques. The effect of substrate choice on lattice strain, film structure, and physical properties was investigated. Our structural data from x-ray diffraction and electron microscopy shows that substrate-induced strain has a marked effect on the structure and crystalline quality of the films. Physical property measurements reveal a dependence of the weak ferromagnetism and lattice polarization on strain, and highlight our ability to control the ferroic properties in NiTiO3 thin films by the choice of substrate. Our results are also consistent with the theoretical prediction that the ferromagnetism in acentric NiTiO3 is polarization-induced. From the substrates studied here, the perovskite substrate LiNbO3 proved to be the most promising one for strong multiferroism.

  13. X-ray magnetic spectroscopy of MBE-grown Mn-doped Bi{sub 2}Se{sub 3} thin films

    SciTech Connect

    Collins-McIntyre, L. J.; Watson, M. D.; Zhang, S. L.; Coldea, A. I.; Hesjedal, T.; Baker, A. A.; Harrison, S. E.; Pushp, A.; Kellock, A. J.; Parkin, S. S. P.; Laan, G. van der

    2014-12-15

    We report the growth of Mn-doped Bi{sub 2}Se{sub 3} thin films by molecular beam epitaxy (MBE), investigated by x-ray diffraction (XRD), atomic force microscopy (AFM), SQUID magnetometry and x-ray magnetic circular dichroism (XMCD). Epitaxial films were deposited on c-plane sapphire substrates by co-evaporation. The films exhibit a spiral growth mechanism typical of this material class, as revealed by AFM. The XRD measurements demonstrate a good crystalline structure which is retained upon doping up to ∼7.5 atomic-% Mn, determined by Rutherford backscattering spectrometry (RBS), and show no evidence of the formation of parasitic phases. However an increasing interstitial incorporation of Mn is observed with increasing doping concentration. A magnetic moment of 5.1 μ{sub B}/Mn is obtained from bulk-sensitive SQUID measurements, and a much lower moment of 1.6 μ{sub B}/Mn from surface-sensitive XMCD. At ∼2.5 K, XMCD at the Mn L{sub 2,3} edge, reveals short-range magnetic order in the films and indicates ferromagnetic order below 1.5 K.

  14. Fabrication and temperature-dependent band gap shrinkage of α-phase Bi2O3 thin films grown by atomic layer deposition method

    NASA Astrophysics Data System (ADS)

    Shen, Yude; Li, Yawei; Jiang, Kai; Zhang, Jinzhong; Duan, Zhihua; Hu, Zhigao; Chu, Junhao

    2013-05-01

    α-Bi2O3 thin films were deposited on different substrates by atomic layer deposition method. The results of X-ray diffraction, high-resolution transmission electron microscopy and X-ray photoelectron spectroscope correspond to α-Bi2O3. The Fourier transform infrared spectroscopy analyses indicate that the reaction is rather complete during the deposition. Optical properties of the films have been investigated using ultraviolet-infrared transmittance spectra in the temperature range of 8-300 K. It is found that the band gap Eg decreases from 3.12 to 3.03 eV with the temperature. The parameters αB and ΘB of the Bose-Einstein model are 69.3 meV and 293.9 K, respectively. The band narrowing coefficient dEg/dT is -0.435 meV/K at room temperature. The present results can be considerable for future application of Bi2O3-based electro-optic and wide temperature range optoelectronic devices.

  15. Strain-dependence Of The Structure And Ferroic Properties Of Epitaxial Ni-1 (-) Ti-x(1) (-) O-y(3) Thin Films Grown On Sapphire Substrates

    SciTech Connect

    Varga, Tamas; Droubay, Timothy C.; Bowden, Mark E.; Stephens, Sean A.; Manandhar, Sandeep; Shutthanandan, V.; Colby, Robert J.; Hu, Dehong; Shelton, William A.; Chambers, Scott A.

    2015-03-01

    Polarization-induced weak ferromagnetism has been predicted a few years back in perovskite MTiO3 (M = Fe, Mn, Ni) [Fennie, Phys. Rev. Lett. 100, 167203 (2008)]. We set out to stabilize this metastable perovskite structure by growing NiTiO3 epitaxially on sapphire Al2O3 (001) substrate, and to control the polar and magnetic properties via strain. Epitaxial Ni1-xTi1-yO3 films of different Ni/Ti ratios and thicknesses were deposited on Al2O3 substrates by pulsed laser deposition at different temperatures, and characterized using several techniques. The effect of film thickness, deposition temperature, and film stoichiometry on lattice strain, film structure, and physical properties was investigated. Our structural data from x-ray diffraction, electron microscopy, and x-ray absorption spectroscopy shows that substrate-induced strain has a marked effect on the structure and crystalline quality of the films. Physical property measurements reveal a dependence of the Néel transition and lattice polarization on strain, and highlight our ability to control the ferroic properties in NiTiO3 thin films by film stoichiometry and thickness.

  16. Influence of ion-to-atom ratio on the microstructure of evaporated molybdenum thin films grown using low energy argon ions

    SciTech Connect

    Yadav, Praveen Kumar Nayak, Maheswar; Rai, Sanjay Kumar; Lodha, Gyanendra Singh; Sant, Tushar; Sharma, Surinder Mohan; Mukherjee, Chandrachur

    2014-03-15

    The authors report the effect of argon ion to molybdenum atom ratio (r) on the microstructure of low energy (70 eV) argon ion assisted electron beam evaporated Mo thin films. Surface roughness, morphology, and crystallinity of Mo films are found to strongly depend on “r.” Increase of “r” from 0 to 100 induces gradual loss in crystallinity, reduction in surface roughness and systematic increase in density of the film. For “r” ∼ 100, average atomic density of the film approaches the bulk value (97%) with lowest surface roughness. Further, increasing “r” up to 170 reduces the atomic density, increases roughness, and increase in crystallinity induced by low energy Ar ion beam. The observed surface roughness and grain size determined by x-ray reflectivity and glancing incidence x-ray diffraction correlate well with atomic force microscopy measurements. This study demonstrates that for r = 100 one gets lowest roughness Mo film with highest density and nearly amorphous microstructure. The growth model is discussed by structural zone model.

  17. Facile synthesis of a mechanically robust and highly porous NiO film with excellent electrocatalytic activity towards methanol oxidation.

    PubMed

    Wang, Luoyuan; Zhang, Guoge; Liu, Yan; Li, Wenfang; Lu, Wei; Huang, Haitao

    2016-06-01

    Considerable research is being conducted in searching for effective anode catalysts in alkaline direct methanol fuel cells (DMFCs). Although significant progress has been achieved, it is still challenging to prepare non-Pt catalysts with both excellent activity and good durability. Herein, a highly porous NiO film is developed by a facile and fast anodization approach. The anodic NiO film demonstrates a high surface area, large mesopore volume and small crystallite size, leading to facilitated adsorption of reaction species, easy electrolyte penetration and fast reaction kinetics. Furthermore, as anodic NiO is grown in situ on a metallic substrate with strong adhesion strength and good electrical contact, it can be used directly as an anode catalyst for methanol oxidation without the need to add any binder or conducting agent. Such an additive-free approach greatly expedites the catalyst preparation process. The anodic NiO shows lower methanol oxidation potential, higher oxidation current and better catalytic durability than most of the state-of-the-art Ni-based catalysts reported elsewhere. As anodization is a simple, low cost and easily scaled up method, the work described here provides an exciting direction to speed up the practical application of alkaline DMFCs. PMID:27189412

  18. Solution-Processible Crystalline NiO Nanoparticles for High-Performance Planar Perovskite Photovoltaic Cells

    PubMed Central

    Kwon, Uisik; Kim, Bong-Gi; Nguyen, Duc Cuong; Park, Jong-Hyeon; Ha, Na Young; Kim, Seung-Joo; Ko, Seung Hwan; Lee, Soonil; Lee, Daeho; Park, Hui Joon

    2016-01-01

    In this work, we report on solution-based p-i-n-type planar-structured CH3NH3PbI3 perovskite photovoltaic (PV) cells, in which precrystallized NiO nanoparticles (NPs) without post-treatment are used to form a hole transport layer (HTL). X-ray diffraction and high-resolution transmission electron microscopy showed the crystallinity of the NPs, and atomic force microscopy and scanning electron microscopy confirmed the uniform surfaces of the resultant NiO thin film and the subsequent perovskite photoactive layer. Compared to the conventional poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) HTL, the NiO HTL had excellent energy-level alignment with that of CH3NH3PbI3 and improved electron-blocking capability, as analyzed by photoelectron spectroscopy and diode modeling, resulting in Voc ~0.13 V higher than conventional PEDOT:PSS-based devices. Consequently, a power conversion efficiency (PCE) of 15.4% with a high fill factor (FF, 0.74), short-circuit current density (Jsc, 20.2 mA·cm−2), and open circuit voltage (Voc, 1.04 V) having negligible hysteresis and superior air stability has been achieved. PMID:27465263

  19. Solution-Processible Crystalline NiO Nanoparticles for High-Performance Planar Perovskite Photovoltaic Cells

    NASA Astrophysics Data System (ADS)

    Kwon, Uisik; Kim, Bong-Gi; Nguyen, Duc Cuong; Park, Jong-Hyeon; Ha, Na Young; Kim, Seung-Joo; Ko, Seung Hwan; Lee, Soonil; Lee, Daeho; Park, Hui Joon

    2016-07-01

    In this work, we report on solution-based p-i-n-type planar-structured CH3NH3PbI3 perovskite photovoltaic (PV) cells, in which precrystallized NiO nanoparticles (NPs) without post-treatment are used to form a hole transport layer (HTL). X-ray diffraction and high-resolution transmission electron microscopy showed the crystallinity of the NPs, and atomic force microscopy and scanning electron microscopy confirmed the uniform surfaces of the resultant NiO thin film and the subsequent perovskite photoactive layer. Compared to the conventional poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) HTL, the NiO HTL had excellent energy-level alignment with that of CH3NH3PbI3 and improved electron-blocking capability, as analyzed by photoelectron spectroscopy and diode modeling, resulting in Voc ~0.13 V higher than conventional PEDOT:PSS-based devices. Consequently, a power conversion efficiency (PCE) of 15.4% with a high fill factor (FF, 0.74), short-circuit current density (Jsc, 20.2 mA·cm‑2), and open circuit voltage (Voc, 1.04 V) having negligible hysteresis and superior air stability has been achieved.

  20. Incorporation of La in epitaxial SrTiO{sub 3} thin films grown by atomic layer deposition on SrTiO{sub 3}-buffered Si (001) substrates

    SciTech Connect

    McDaniel, Martin D.; Ngo, Thong Q.; Ekerdt, John G.; Posadas, Agham; Demkov, Alexander A.; Karako, Christine M.; Bruley, John; Frank, Martin M.; Narayanan, Vijay

    2014-06-14

    Strontium titanate, SrTiO{sub 3} (STO), thin films incorporated with lanthanum are grown on Si (001) substrates at a thickness range of 5–25 nm. Atomic layer deposition (ALD) is used to grow the La{sub x}Sr{sub 1−x}TiO{sub 3} (La:STO) films after buffering the Si (001) substrate with four-unit-cells of STO deposited by molecular beam epitaxy. The crystalline structure and orientation of the La:STO films are confirmed via reflection high-energy electron diffraction, X-ray diffraction, and cross-sectional transmission electron microscopy. The low temperature ALD growth (∼225 °C) and post-deposition annealing at 550 °C for 5 min maintains an abrupt interface between Si (001) and the crystalline oxide. Higher annealing temperatures (650 °C) show more complete La activation with film resistivities of ∼2.0 × 10{sup −2} Ω cm for 20-nm-thick La:STO (x ∼ 0.15); however, the STO-Si interface is slightly degraded due to the increased annealing temperature. To demonstrate the selective incorporation of lanthanum by ALD, a layered heterostructure is grown with an undoped STO layer sandwiched between two conductive La:STO layers. Based on this work, an epitaxial oxide stack centered on La:STO and BaTiO{sub 3} integrated with Si is envisioned as a material candidate for a ferroelectric field-effect transistor.

  1. X-ray photoelectron diffraction study of thin Cu films grown on clean Ru(0001) and O-precovered Ru(0001)

    NASA Astrophysics Data System (ADS)

    Ruebush, S. D.; Couch, R. E.; Thevuthasan, S.; Fadley, C. S.

    1999-02-01

    We have studied the epitaxial growth modes and near-surface interlayer relaxation of thin Cu films on Ru(0001) using X-ray photoelectron diffraction (XPD), measuring experimental Cu 2p 3/2 ( Ekin=556 eV) and Ru 3d ( Ekin=1206 eV) intensities over one-third of the nearly full 2 π solid angle above the surface for Cu coverages from submonolayer up to 40 monolayers. Reference Cu 2p 3/2 data for a clean Cu(111) surface have also been obtained from Naumović et al. and in our laboratory. These data have been compared to single scattering cluster (SSC) and more accurate multiple scattering cluster (MSC) calculations via a sum of five R-factors to derive precise structural information. MSC calculations are found to give a more accurate description for layers of ≥4 ML thickness, and comparisons of experiment and theory are also improved by allowing more accurately for the effective degree of angular averaging involved. Calculations for thicker layers are also found to converge by ˜5 ML. Our analysis indicates that the first Cu layer grows pseudomorphically on Ru(0001), in agreement with prior studies. An R-factor analysis comparing MSC and SSC calculations to experimental results further indicates that the Cu-Ru interlayer spacing at 1 monolayer (ML) is about 2.15 Å, in excellent agreement with prior low-energy ion scattering (LEIS) and low-energy electron diffraction (LEED) experimental studies, as well as with prior linearized augmented plane-wave (LAPW) calculations. At higher coverages, comparison of our data to SSC and MSC calculations for various atomic clusters indicates that the short-range structure is fcc Cu(111)-like, but with significant interlayer contraction which persists up to ≥5 ML coverage. Prior STM work by Behm et al. has shown a series of misfit dislocation structures in the top layer of the Cu film at higher coverages from 2 to 4 ML. Our data indicate that these misfit dislocation structures thread to the Cu/Ru interface rather than occurring

  2. Photoluminescence properties of SrAl{sub 2}O{sub 4}:Eu{sup 2+},Dy{sup 3+} thin phosphor films grown by pulsed laser deposition

    SciTech Connect

    Ntwaeaborwa, O. M.; Nsimama, P. D.; Pitale, Shreyas; Nagpure, I. M.; Kumar, Vinay; Coetsee, E.; Terblans, J. J.; Swart, H. C.; Sechogela, P. T.

    2010-07-15

    Thin films of SrAl{sub 2}O{sub 4}:Eu{sup 2+},Dy{sup 3+} phosphor were deposited on silicon [Si (100)] substrates using a 248 nm KrF pulsed laser. Deposition parameters, such as substrate temperature, pulse repetition rate, number of laser pulses, and base pressure, were varied during the film deposition process. Based on the x-ray diffraction data, all the films were amorphous but were emitting visible light when excited by a monochromatic xenon lamp. The chemical composition and the stoichiometry of the films determined by the Rutherford backscattering spectroscopy were consistent with the commercial SrAl{sub 2}O{sub 4}:Eu{sup 2+},Dy{sup 3+} powder used to prepare the films. Photoluminescence (PL) emission spectra of the films were characterized by major green emission with a maximum at {approx}520 nm and minor red emission with a maximum at 630 nm. The green and red photoluminescence at 520 and 630 nm are associated with the 4f{sup 6}5d{yields}4f{sup 7}({sup 8}S{sub 7/2}) and {sup 5}D{sub 0}-{sup 7}F{sub 2} transitions of Eu{sup 2+} and residual Eu{sup 3+} ions, respectively. Brighter films were shown to have relatively higher values of the root mean square surface roughness, which were determined from the atomic force microscopy data. The effects of processing parameters on the PL intensity are discussed.

  3. Layer-by-layer grown scalable redox-active ruthenium-based molecular multilayer thin films for electrochemical applications and beyond.

    PubMed

    Kaliginedi, Veerabhadrarao; Ozawa, Hiroaki; Kuzume, Akiyoshi; Maharajan, Sivarajakumar; Pobelov, Ilya V; Kwon, Nam Hee; Mohos, Miklos; Broekmann, Peter; Fromm, Katharina M; Haga, Masa-aki; Wandlowski, Thomas

    2015-11-14

    Here we report the first study on the electrochemical energy storage application of a surface-immobilized ruthenium complex multilayer thin film with anion storage capability. We employed a novel dinuclear ruthenium complex with tetrapodal anchoring groups to build well-ordered redox-active multilayer coatings on an indium tin oxide (ITO) surface using a layer-by-layer self-assembly process. Cyclic voltammetry (CV), UV-Visible (UV-Vis) and Raman spectroscopy showed a linear increase of peak current, absorbance and Raman intensities, respectively with the number of layers. These results indicate the formation of well-ordered multilayers of the ruthenium complex on ITO, which is further supported by the X-ray photoelectron spectroscopy analysis. The thickness of the layers can be controlled with nanometer precision. In particular, the thickest layer studied (65 molecular layers and approx. 120 nm thick) demonstrated fast electrochemical oxidation/reduction, indicating a very low attenuation of the charge transfer within the multilayer. In situ-UV-Vis and resonance Raman spectroscopy results demonstrated the reversible electrochromic/redox behavior of the ruthenium complex multilayered films on ITO with respect to the electrode potential, which is an ideal prerequisite for e.g. smart electrochemical energy storage applications. Galvanostatic charge-discharge experiments demonstrated a pseudocapacitor behavior of the multilayer film with a good specific capacitance of 92.2 F g(-1) at a current density of 10 μA cm(-2) and an excellent cycling stability. As demonstrated in our prototypical experiments, the fine control of physicochemical properties at nanometer scale, relatively good stability of layers under ambient conditions makes the multilayer coatings of this type an excellent material for e.g. electrochemical energy storage, as interlayers in inverted bulk heterojunction solar cell applications and as functional components in molecular electronics applications

  4. Epitaxial thin films of the multiferroic double perovskite Bi2FeCrO6 grown on (100)-oriented SrTiO3 substrates: Growth, characterization, and optimization

    NASA Astrophysics Data System (ADS)

    Nechache, Riad; Harnagea, Catalin; Carignan, Louis-Philippe; Gautreau, Olivier; Pintilie, Lucian; Singh, Mangala P.; Ménard, David; Fournier, Patrick; Alexe, Marin; Pignolet, Alain

    2009-03-01

    The influence of the deposition pressure (PO2) and substrate temperature (TS) during the growth of Bi2FeCrO6 thin films grown by pulsed laser deposition has been investigated. It is found that the high volatility of Bi makes the deposition very difficult and that the growth of pure Bi2FeCrO6 thin films on SrTiO3 substrates is possible only in a narrow deposition parameter window. We find that the pure Bi2FeCrO6 phase is formed within a narrow window around an oxygen pressure PO2=1.2×10-2 mbar and around a substrate temperature TS=680 °C. At lower temperature or higher pressure, Bi7.38Cr0.62O12+x (also called b∗Bi2O3) and Bi2Fe4O9/Bi2(Fe,Cr)4O9+x phases are detected, while at lower pressure or higher temperature a (Fe,Cr)3O4 phase forms. Some of these secondary phases are not well known and have not been previously studied. We previously reported Fe/Cr cation ordering as the probable origin of the tenfold improvement in magnetization at saturation of our Bi2FeCrO6 film, compared to BiFeO3. Here, we address the effect of the degree of cationic ordering on the magnetic properties of the Bi2FeCrO6 single phase. Polarization measurements at room temperature reveal that our Bi2FeCrO6 films have excellent ferroelectric properties with ferroelectric hysteresis loops exhibiting a remanent polarization as high as 55-60 μC/cm2 along the pseudocubic [001] direction.

  5. Synthesis and electrochemical properties of NiO nanospindles

    SciTech Connect

    Zhou, Hai; Lv, Baoliang; Xu, Yao; Wu, Dong

    2014-02-01

    Graphical abstract: NiO nanospindles with a different electrochemical activity as compared to those previous reports were synthesized via an agglomeration–dissolution–recrystallization growth process without the addition of any surfactant. - Highlights: • NiO nanospindles were synthesized without the addition of any surfactant. • The agglomeration–dissolution–recrystallization growth process was used to explain the precursors’ formation process of the spindle-like NiO. • As-obtained spindle-like NiO showed a different electrochemical activity as compared to those previous reports. - Abstract: NiO nanospindles were successfully synthesized via a hydrothermal and post-treatment method. The as-synthesized nanospindles were about several hundred nanometers in width and about one micrometer in length. X-ray diffraction (XRD) analysis revealed that the spindle-like structure was cubic NiO phase crystalline. Scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM) analysis indicated that these NiO nanospindles were of single crystal nature. On the basis of time-dependent experiments, a possible agglomeration–dissolution–recrystallization growth process was proposed to explain the formation process of the spindle-like precursors. The cyclic voltammetry (CV) measurement showed that the as-prepared spindle-like NiO exhibited a pseudo-capacitance behavior.

  6. Multiatom Resonant Photoemission on NiO

    NASA Astrophysics Data System (ADS)

    Fadley, Charles; Mannella, Norman; Yang, See-Hun; Mun, Simon; van Hove, Michel

    2002-03-01

    In several recent papers, it has been pointed out that the core photoemission intensities of a given atom can be modified significantly when the photon energy is tuned through the absorption edge of a neighboring atom. Although some first experimental results of this type were distorted by detector non-linearity, a clear picture of the phenomenon has now emerged, with both macroscopic x-ray optical (dielectric) and microscopic quantum mechanical models quantitatively describing the effects [1]. In this talk, we will clarify a remaining experimental discrepancy with these models [2] by presenting new experimental results for O 1s photoemission from NiO(001) as photon energy is scanned through the Ni 2p absorption edges, and comparing the data to x-ray optical calculations. Other data for an adsorbate and free molecules will also be discussed. This work was supported by DOE contract No. DE-AC03-76SF00098. [1] A.W. Kay, F.J. Garcia de Abajo, S.-H. Yang, E. Arenholz, B.S. Mun, N. Mannella, Z. Hussain, M.A. Van Hove, and C.S. Fadley, Phys. Rev. B 63, 115119 (2001). [2] M. Finazzi, G. Ghiringhelli, O. Tjernberg, L. Duo, A. Tagliaferri, P. Ohresser, and N. B. Brookes, photoemission measurements for CuO and NiO, Phys. Rev. B 62, R16215 (2000).

  7. Comparative study of magnetic and magnetotransport properties of Sm0.55Sr0.45MnO3 thin films grown on different substrates

    NASA Astrophysics Data System (ADS)

    Srivastava, Manoj K.; Singh, Sandeep; Siwach, P. K.; Kaur, Amarjeet; Awana, V. P. S.; Maurya, K. K.; Singh, H. K.

    2013-05-01

    Highly oriented polycrystalline Sm0.55Sr0.45MnO3 thin films (thickness ˜100 nm) deposited on LaAlO3 (LAO, (001)), SrTiO3 (STO, (001)) and (La0.18Sr0.82) (Al0.59Ta0.41)O3 (LSAT, (001)) single crystal substrates by ultrasonic nebulized spray pyrolysis have been studied. The out of plane lattice parameter (OPLP) of the film on LAO is slightly larger than that of the corresponding bulk. In contrast, the OPLP of the films on STO and LSAT are slightly smaller than the corresponding bulk value. This suggests that the film on LAO is under compressive strain while LSAT and STO are under tensile strain. The films on LAO and LSAT show simultaneous paramagnetic-ferromagnetic (PM-FM) and insulator-metal transition (IMT) temperature at TC/TIM ˜ 165 K and 130 K, respectively. The PM-FM and IM transition occur at TC ˜ 120 K and TIM ˜ 105 K, respectively in the film on STO substrate. At T < TC, the zero field cooled-field cooled (ZFC-FC) magnetization of all the films shows strong bifurcation. This suggests the presence of a metamagnetic state akin to cluster glass formed due to coexisting FM and antiferromagnetic-charge order (AFM-CO) clusters. All the films show colossal magnetoresistance but its temperature and magnetic field dependence are drastically different. The films on LAO and STO show peak CMR around TC/TIM, while the film on LSAT shows MR > 99 % over a very wide temperature range of ˜40 K centred on TC/TIM. In the lower temperature region the magnetic field dependent isothermal resistivity also shows signature of metamagnetic transitions. The observed results have been explained in terms of the variation of the relative fractions of the coexisting FM and AFM-CO phases as a function of the substrate induced strain and oxygen vacancy induced quenched disorder.

  8. NiO nanoarrays of a few atoms thickness on 3D nickel network for enhanced pseudocapacitive electrode applications

    NASA Astrophysics Data System (ADS)

    Senthilkumar, Velusamy; Kadumudi, Firoz Babu; Ho, Nhu Thuy; Kim, Ji-Woong; Park, Sungkyun; Bae, Jong-Seong; Choi, Won Mook; Cho, Shinuk; Kim, Yong Soo

    2016-01-01

    The present work focuses on the development of template-free mesoporous NiO nanoarrays with large surface area grown on 3D nickel foam networks by a seed mediated aqueous chemical growth technique and subsequent annealing process. The resultant binder-free, well-aligned and vertically grown NiO nanoarrays exhibits a micron-sized planar structure as well as an ultrathin thickness (˜7 nm). The unique surface and electronic structure facilitates surface-dependent electrochemical reaction processes with no dead volume. They deliver a high capacitance of 2065 F g-1 at a current density of 16 A g-1 as a three electrode system. A specific capacitance of 1247 F g-1 is maintained at a higher current rate of 70 A g-1 with 88.9% retention after 5000 cycles. Finally, in a solid-state asymmetric supercapacitor configuration using NiO//activated carbon, the device delivers an enhanced supercapacitive performance, with an energy density of 43.5 Wh kg-1 and power density of 2.1 kW kg-1. Thus, the current research paves the way for the use of NiO nanoarrays as an electrode material for practical supercapacitor devices with higher cycling retention and rate capacity.

  9. Layer-by-layer grown scalable redox-active ruthenium-based molecular multilayer thin films for electrochemical applications and beyond

    NASA Astrophysics Data System (ADS)

    Kaliginedi, Veerabhadrarao; Ozawa, Hiroaki; Kuzume, Akiyoshi; Maharajan, Sivarajakumar; Pobelov, Ilya V.; Kwon, Nam Hee; Mohos, Miklos; Broekmann, Peter; Fromm, Katharina M.; Haga, Masa-Aki; Wandlowski, Thomas

    2015-10-01

    Here we report the first study on the electrochemical energy storage application of a surface-immobilized ruthenium complex multilayer thin film with anion storage capability. We employed a novel dinuclear ruthenium complex with tetrapodal anchoring groups to build well-ordered redox-active multilayer coatings on an indium tin oxide (ITO) surface using a layer-by-layer self-assembly process. Cyclic voltammetry (CV), UV-Visible (UV-Vis) and Raman spectroscopy showed a linear increase of peak current, absorbance and Raman intensities, respectively with the number of layers. These results indicate the formation of well-ordered multilayers of the ruthenium complex on ITO, which is further supported by the X-ray photoelectron spectroscopy analysis. The thickness of the layers can be controlled with nanometer precision. In particular, the thickest layer studied (65 molecular layers and approx. 120 nm thick) demonstrated fast electrochemical oxidation/reduction, indicating a very low attenuation of the charge transfer within the multilayer. In situ-UV-Vis and resonance Raman spectroscopy results demonstrated the reversible electrochromic/redox behavior of the ruthenium complex multilayered films on ITO with respect to the electrode potential, which is an ideal prerequisite for e.g. smart electrochemical energy storage applications. Galvanostatic charge-discharge experiments demonstrated a pseudocapacitor behavior of the multilayer film with a good specific capacitance of 92.2 F g-1 at a current density of 10 μA cm-2 and an excellent cycling stability. As demonstrated in our prototypical experiments, the fine control of physicochemical properties at nanometer scale, relatively good stability of layers under ambient conditions makes the multilayer coatings of this type an excellent material for e.g. electrochemical energy storage, as interlayers in inverted bulk heterojunction solar cell applications and as functional components in molecular electronics applications

  10. Effects of ferroelectric-poling-induced strain on magnetic and transport properties of La0.67Ba0.33MnO3 thin films grown on (111)-oriented ferroelectric substrates

    NASA Astrophysics Data System (ADS)

    Zhu, Q. X.; Zheng, M.; Yang, M. M.; Li, X. M.; Wang, Y.; Shi, X.; Chan, H. L. W.; Luo, H. S.; Li, X. G.; Zheng, R. K.

    2013-09-01

    La0.67Ba0.33MnO3 thin films were epitaxially grown on (111)-oriented 0.31Pb(In1/2Nb1/2)O3-0.35Pb(Mg1/3Nb2/3)O3-0.34PbTiO3 ferroelectric single-crystal substrates. During ferroelectric poling and polarization rotation, the resistance of La0.67Ba0.33MnO3 films tracks the electric-field-induced in-plane strain of substrates effectively, implying strain-mediated coupling. Upon poling along the [111] direction, ferromagnetism is suppressed for T < 175 K, but enhanced for T > 175 K, which is explained by magnetoelastic coupling that modifies the film's magnetic anisotropy. Our findings also show that the magnetic field has an opposite effect on the strain-tunability of resistance [i.e.,(ΔR/R)strain] above and below the Curie temperature TC, which is interpreted within the framework of phase separation.

  11. Synthesis and characterization of electron doped La{sub 0.85}Te{sub 0.15}MnO{sub 3} thin film grown on LaAlO{sub 3} substrate by pulsed laser deposition technique

    SciTech Connect

    Bhat, Irshad Husain, Shahid; Patil, S. I.; Khan, Wasi; Ali, S. Asad

    2015-06-24

    We report the structural, morphological and magneto-transport properties of electron doped La{sub 0.85}Te{sub 0.15}MnO{sub 3} (LTMO) thin film grown on (001) LaAlO{sub 3} single crystal substrate by pulsed laser deposition (PLD). X-ray diffraction (XRD) results confirm that the film has good crystalline quality, single phase, and c-axis orientation. The atomic force microscopy (AFM) results have revealed that the film consists of grains with the average size in a range of 20–30 nm and root-mean square (rms) roughness of 0.27nm. The resistivity versus temperature measurement exhibits an insulator to metal transition (MIT). We have noticed a huge value of magnetoresistance (∼93%) close to MIT in presence of 8T field. X-ray photoemission spectroscopy confirms the electron doping and suggests that Te ions could be in the Te{sup 4+} state, while the Mn ions stay in the Mn{sup 2+} and Mn{sup 3+} valence state.

  12. Transport properties and c/a ratio of V{sub 2}O{sub 3} thin films grown on C- and R-plane sapphire substrates by pulsed laser deposition

    SciTech Connect

    Sakai, Joe; Limelette, Patrice

    2015-12-14

    We prepared V{sub 2}O{sub 3} thin films on C- or R-plane sapphire (Al{sub 2}O{sub 3}) substrates by a pulsed laser deposition method. X-ray diffraction analyses confirmed that single-phase V{sub 2}O{sub 3} films were epitaxially grown on both C- and R-planes under an Ar gas ambient of 2 × 10{sup −2} mbar at a substrate temperature of 873 K. Depending on the deposition conditions, c/a ratios at room temperature of (0001)-oriented V{sub 2}O{sub 3} films widely ranged from 2.79 to 2.88. Among them, the films of 2.81 ≤ c/a ≤ 2.84 showed complex metal (M)–insulator (I)–M transition during cooling from 300 to 10 K, while those of larger c/a ratios were accompanied by metallic properties throughout this temperature range. All the films on R-plane substrates underwent simple M-I transition at ∼150 K, which was more abrupt than the films on C-plane, whereas their c/a ratios were narrowly distributed. The distinct difference of M-I transition properties between C- and R-plane films is explained by the intrinsic a- and c-axes evolution through the transition from M to I phases.

  13. Heterogeneous distribution of B-site cations in BaZrxTi1-xO3 epitaxial thin films grown on (0 0 1) SrTiO3 by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Ventura, J.; Polo, M. C.; Ferrater, C.; Hernández, S.; Sancho-Parramón, J.; Coy, L. E.; Rodríguez, L.; Canillas, A.; Fábrega, L.; Varela, M.

    2016-09-01

    The isovalent susbstitution of Ti4+ by Zr4+ in BaZrxTi1-xO3 modifies the dielectric character of ferroelectric BaTiO3 yielding different behaviours such as relaxor, polar cluster, etc. The dynamic coupling between BaTiO3 polar nanoregions and BaZrO3 nonpolar ones as well as microstrain between them are thought to be behind such a rich phase diagram. However, these short-range compositonal variations are elusive to detect and this topic is thus rarely addressed. We have grown epitaxial thin films of BaZrxTi1-xO3 on (0 0 1)-oriented SrTiO3 substrates by pulsed laser deposition sweeping the entire composition range between BaTiO3 and BaZrO3 in increments of 0.1 in x. Several characterization techniques (AFM, TEM, XRD, Raman spectroscopy) were used for this research in order to understand the morphological and structural properties of the deposited films. Ellipsometric measurements allowed the calculation of the band gap energy of the films. This work demonstrates the existence of a heterogeneous distribution in the substitution of titanium by zirconium yielding relaxor and polar cluster nanoregions.

  14. Effect of nitrogen flow rate on structural, morphological and optical properties of In-rich InxAl1-xN thin films grown by plasma-assisted dual source reactive evaporation

    NASA Astrophysics Data System (ADS)

    Alizadeh, M.; Ganesh, V.; Goh, B. T.; Dee, C. F.; Mohmad, A. R.; Rahman, S. A.

    2016-08-01

    In-rich InxAl1-xN thin films were deposited on quartz substrate at various nitrogen flow rates by plasma-assisted dual source reactive evaporation technique. The elemental composition, surface morphology, structural and optical properties of the films were investigated by X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FESEM), Raman spectroscopy, X-ray diffraction (XRD), UV-vis spectrophotometer and photoluminescence (PL) measurements. XPS results revealed that the indium composition (x) of the InxAl1-xN films increases from 0.90 to 0.97 as the nitrogen flow rate is increased from 40 to 100 sccm, respectively. FESEM images of the surface and cross-sectional microstructure of the InxAl1-xN films showed that by increasing the N2 flow rate, the grown particles are highly agglomerated. Raman and XRD results indicated that by increasing nitrogen flow rate the In-rich InxAl1-xN films tend to turn into amorphous state. It was found that band gap energy of the films are in the range of 0.90-1.17 eV which is desirable for the application of full spectra solar cells.

  15. Structural and optical properties of Si-doped Al0.08In0.08Ga0.84N thin films grown on different substrates for optoelectronic devices

    NASA Astrophysics Data System (ADS)

    Ghazai, Alaa Jabbar; Hassan, Haslan Abu; Hassan, Zanuri Bint

    2016-07-01

    The objective of the current study is to characterize the optoelectronic properties of quaternary n-Al0.08In0.08Ga0.84N thin films grown via molecular beam epitaxy (MBE) on sapphire (Al2O3) and silicon (Si) substrates for different optoelectronic applications. Due to mismatch problems between the epilayer and substrates, the AlN buffer layer was inserted at low temperature to reduce the lattice mismatch to approximately 4% for the samples, to produce high-quality epitaxy films. Defect-free films with high structural, optical and electrical qualities were obtained. Their small full width at half maximum, low compressive strain, relatively large grain size and low dislocation density which produced smooth surfaces without any separation phases or cracks were characterized using X-ray diffraction analysis. Scanning electron microscopy, energy-dispersive X-ray microscopy and atomic force microscopy images confirmed these characterizations. Furthermore, high optical quality, as well as high absorption and absorption coefficients were observed using photoluminescence and UV-VIS spectroscopy; however, a red shift was observed in the PL peak of the near band edge of 3.158 eV of the sample on Si substrate compared with 3.37 eV for the sample on sapphire substrate which is attributed to the compressive strain and occurrence of the quantum confined Stark effect.

  16. Process modeling and analysis of structure and stoichiometry of magnesium oxide nano thin films grown by molecular beam epitaxy on 6 hydrogen-silicon carbide substrates

    NASA Astrophysics Data System (ADS)

    Uddin, Ghulam Moeen

    In recent years there has been an increasing interest in effective integration of nano scale functional oxides with semiconductors for third and fourth generation nano devices including high-K dielectrics based electronic devices and paradigm-shifting spintronics-based circuits. In this research we investigate the growth of MgO nano thin films on 6H-SiC substrate in a molecular beam epitaxy process. Here MgO serves as a template layer to minimize the mismatch with both substrate and a functional oxide films such as BTO and BaM. In this research we constructed neural network based process models using historical experimental data. Based on these process models we performed structural and stoichiometric analyses through both design of experiments and Monte Carlo simulation. We found that the percentage starting oxygen on the substrate is the most critical variable that promotes the undesired bonding states, i.e., Mg-OH and excessive strain in film crystalline structure. In addition the impact of percentage of starting oxygen on structure and stoichiometry is affected by the film thickness. The interaction between substrate temperature and oxygen on the starting substrate surface is the critical pair that affects the dynamics of Mg-OH bonding state. This study helped us analyze the process behavior and gain process knowledge to conduct systematic experimentation. After conducting the systematic experiments we quantitatively studied the causal relationship the undesired bonding states and the percentage starting oxygen at 3 levels of film thickness. Moreover, the cleaning of silicon carbide (6H-SiC) substrate surface is an essential and important step to grow MgO films with minimum undesired bonding states. We investigated high temperature hydrogen etching process to clean the substrate surface. In this research we studied the impact of cleaning time and cleaning temperature by analyzing the reflection high energy electron diffraction (RHEED) structural performance

  17. Synthesis and microwave absorption enhancement of graphene@Fe3O4@SiO2@NiO nanosheet hierarchical structures

    NASA Astrophysics Data System (ADS)

    Wang, Lei; Huang, Ying; Sun, Xu; Huang, Haijian; Liu, Panbo; Zong, Meng; Wang, Yan

    2014-02-01

    Hierarchical structures of graphene@Fe3O4@SiO2@NiO nanosheets were prepared by combining the versatile sol-gel process with a hydrothermal reaction. Graphene@Fe3O4 composites were first synthesized by the reduction reaction between FeCl3 and diethylene glycol (DEG) in the presence of GO. Then, graphene@Fe3O4 was coated with SiO2 to obtain graphene@Fe3O4@SiO2. Finally, NiO nanosheets were grown perpendicularly on the surface of graphene@Fe3O4@SiO2 and graphene@Fe3O4@SiO2@NiO nanosheet hierarchical structures were formed. Moreover, the microwave absorption properties of both graphene@Fe3O4 and graphene@Fe3O4@SiO2@NiO nanosheets were investigated between 2 and 18 GHz microwave frequency bands. The electromagnetic data demonstrate that graphene@Fe3O4@SiO2@NiO nanosheet hierarchical structures exhibit significantly enhanced microwave absorption properties compared with graphene@Fe3O4, which probably originate from the unique hierarchical structure with a large surface area and high porosity.

  18. Diffusion induced recrystallization of NiO

    SciTech Connect

    Parthasarathy, T.A.; Shewmon, P.G.

    1984-01-01

    It is shown that changing the composition of a sample from that in equilibrium with air at 1200/sup 0/C to that in equilibrium with oxygen saturated Ni at 800-900/sup 0/C recrystallize the surface to a finer grain size. Annealing back at 1200/sup 0/C in air will again recrystallize the surface layer. This type of diffusion-induced recrystallization has been observed in metals, but never reported in ceramics. Its occurrence in NiO is interpreted as a demonstration that diffusion-induced grain boundary motion is driven directly by the free energy of mixing defects into the matrix instead of indirectly as suggested by others.

  19. Mesoscale assembly of NiO nanosheets into spheres

    SciTech Connect

    Zhang Meng; Yan Guojin; Hou Yonggai; Wang Chunhua

    2009-05-15

    NiO solid/hollow spheres with diameters about 100 nm have been successfully synthesized through thermal decomposition of nickel acetate in ethylene glycol at 200 deg. C. These spheres are composed of nanosheets about 3-5 nm thick. Introducing poly(vinyl pyrrolidone) (PVP) surfactant to reaction system can effectively control the products' morphology. By adjusting the quantity of PVP, we accomplish surface areas-tunable NiO assembled spheres from {approx}70 to {approx}200 m{sup 2} g{sup -1}. Electrochemical tests show that NiO hollow spheres deliver a large discharge capacity of 823 mA h g{sup -1}. Furthermore, these hollow spheres also display a slow capacity-fading rate. A series of contrastive experiments demonstrate that the surface area of NiO assembled spheres has a noticeable influence on their discharge capacity. - Graphical abstract: The mesoscale assembly of NiO nanosheets into spheres have been achieved by a solvothermal method. N{sub 2} adsorption/desorption isotherms show the S{sub BET} of NiO is tunable. NiO spheres show large discharge capacity and slow capacity-fading rate.

  20. Spin Seebeck effect through antiferromagnetic NiO

    NASA Astrophysics Data System (ADS)

    Prakash, Arati; Brangham, Jack; Yang, Fengyuan; Heremans, Joseph P.

    2016-07-01

    We report temperature-dependent spin Seebeck measurements on Pt/YIG bilayers and Pt/NiO/YIG trilayers, where YIG (yttrium iron garnet, Y3F e5O12 ) is an insulating ferrimagnet and NiO is an antiferromagnet at low temperatures. The thickness of the NiO layer is varied from 0 to 10 nm. In the Pt/YIG bilayers, the temperature gradient applied to the YIG stimulates dynamic spin injection into the Pt, which generates an inverse spin Hall voltage in the Pt. The presence of a NiO layer dampens the spin injection exponentially with a decay length of 2 ± 0.6 nm at 180 K. The decay length increases with temperature and shows a maximum of 5.5 ± 0.8 nm at 360 K. The temperature dependence of the amplitude of the spin Seebeck signal without NiO shows a broad maximum of 6.5 ± 0.5 μV/K at 20 K. In the presence of NiO, the maximum shifts sharply to higher temperatures, likely correlated to the increase in decay length. This implies that NiO is most transparent to magnon propagation near the paramagnet-antiferromagnet transition. We do not see the enhancement in spin current driven into Pt reported in other papers when 1-2 nm NiO layers are sandwiched between Pt and YIG.