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Sample records for indium nitride inn

  1. Studies of indium amides and nitrides

    SciTech Connect

    Purdy, A.P.; Berry, A.D.

    1993-12-31

    A reaction between InI{sub 3} and 3 eq. of KNH{sub 2} in liquid NH{sub 3} forms indium(III) amide (In(NH{sub 2}){sub 3}) a white, nearly insoluble compound. Indium(III) amide readily combines with KNH{sub 2} in liquid NH{sub 3} to form the mixed metal amide K{sub 2}In(NH{sub 2}){sub 5}. Other potassium and sodium derivatives MxIn(NH{sub 2}){sub 3+x} derivatives were prepared in a similar manner, but not all were obtained pure in the solid state. An impure tri-lithium derivative (Li{sub 3}In(NH{sub 2}){sub 6}) was obtained by adding a KNH{sub 2} solution (6 eq) to a solution of InI{sub 3} and 3 eq of LiI. Pyrolysis (in vacuo 25-300{degrees}C, under N{sub 2} 300-400{degrees}C) of In(NH{sub 2}){sub 3} or MxIn(NH{sub 2}){sub x+3} (M = Na, K) to 400{degrees}C results in the formation of InN, but indium metal is also formed from some of the mixed metal amides. The product from thermal decomposition of Li{sub 3}In(NH{sub 2}){sub 6} under vacuum was tentatively identified as the ternary nitride Li{sub 3}InN{sub 2}. Products were characterized by elemental analysis, IR spectroscopy, and powder x-ray diffraction experiments.

  2. Molecular beam epitaxy growth of indium nitride and indium gallium nitride materials for photovoltaic applications

    NASA Astrophysics Data System (ADS)

    Trybus, Elaissa

    The objective of the proposed research is to establish the technology for material growth by molecular beam epitaxy (MBE) and fabrication of indium gallium nitride/gallium nitride (InxGa1-xN/GaN) heterojunction solar cells. InxGa1-xN solar cells have the potential to span 90% of the solar spectrum, however there has been no success with high indium (In) incorporation and only limited success with low In incorporation InxGa1-xN. Therefore, this present work focuses on 15--30% In incorporation leading to a bandgap value of 2.3--2.8 eV. This work will exploit the revision of the indium nitride (InN) bandgap value of 0.68 eV, which expands the range of the optical emission of nitride-based devices from ultraviolet to near infrared regions, by developing transparent In xGa1-xN solar cells outside the visible spectrum. Photovoltaic devices with a bandgap greater than 2.0 eV are attractive because over half the available power in the solar spectrum is above the photon energy of 2.0 eV. The ability of InxGa1-xN materials to optimally span the solar spectrum offers a tantalizing solution for high-efficiency photovoltaics. This work presents results confirming the revised bandgap of InN grown on germanium (Ge) substrates and the effects of oxygen contamination on the bandgap. This research adds to the historical discussion of the bandgap value of InN. Using the metal modulated epitaxy (MME) technique in a new, ultra-clean refurbished MBE system, an innovative growth regime is established where In and Ga phase separation is diminished by increasing the growth rate for In xGa1-xN. The MME technique modulates the metal shutters with a fixed duty cycle while maintaining a constant nitrogen flux and proves effective for improving crystal quality and p-type doping. InxGa 1-xN/GaN heterojunction solar cells require p-type doping to create the p-n subcell collecting junction, which facilitates current collection through the electrostatic field created by spatially separated ionized

  3. Synthesis of long indium nitride nanowires with uniform diameters in large quantities.

    PubMed

    Luo, Shudong; Zhou, Weiya; Zhang, Zengxing; Liu, Lifeng; Dou, Xinyuan; Wang, Jianxiong; Zhao, Xiaowei; Liu, Dongfang; Gao, Yan; Song, Li; Xiang, Yanjuan; Zhou, Jianjun; Xie, Sishen

    2005-10-01

    Large quantities of indium nitride (InN) nanowires are synthesized by the in situ nitriding of indium oxide (In(2)O(3)) powders in an ammonia (NH(3)) flux. Tens of milligrams of nanowires are obtained in one batch. Every 100 mg of In(2)O(3) starting powder can produce up to 65 mg of InN nanowires under the optimized conditions. The synthesized nanowires grow along the [001] direction with excellent crystallinity. They are of high purity and are 30-50 microm in length with an almost uniform diameter of about 100 nm. Photoluminescence measurements of the nanowires exhibit a strong peak at 707 nm. An optical bandgap of about 1.7 eV is estimated based on the absorption spectrum. The experimental results also demonstrate that the approach of nitriding In(2)O(3) powders in situ is feasible for the synthesis of high-purity InN nanowires in large quantities, with good reproducibility and without catalyst materials. The synthesis of InN nanowires in large quantities would be of benefit to the further study and understanding of their intrinsic properties, as well as being advantageous for their potential application in nanodevices. PMID:17193386

  4. Compositional analysis of dilute nitride doped indium antimonide bulk crystal by VDS technique

    NASA Astrophysics Data System (ADS)

    Deshpande, Manisha; Maske, Dilip; Choudhari, Rashmi; Arora, Brij Mohan; Gadkari, Dattatray

    2016-05-01

    Dilute nitrides are suitable materials for fabrication of devices in detection of long wavelength infrared region. Dilute nitride doped Indium antimonide bulk crystals were grown using vertical directional solidification technique. The compositional characteristics of the crystals were carried out using EDS. The analysis was simulated and compared with observations using DTSA II software for accuracy. The ingots have uniform composition of Indium and Antimony. The actual nitrogen composition measured using EDS was 0.136% for doped nitrogen composition 0.1% except near conical end where it was 0.1%. The study of bonding between nitrogen, Indium and antimony was carried out using SIMS. The analysis shows strong presence of In-N bonding along with In-Sb bonds which indicates nitrogen has replaced antimony atoms in crystal lattice.

  5. An analytical model of anisotropic low-field electron mobility in wurtzite indium nitride

    NASA Astrophysics Data System (ADS)

    Wang, Shulong; Liu, Hongxia; Song, Xin; Guo, Yulong; Yang, Zhaonian

    2014-03-01

    This paper presents a theoretical analysis of anisotropic transport properties and develops an anisotropic low-field electron analytical mobility model for wurtzite indium nitride (InN). For the different effective masses in the Γ-A and Γ-M directions of the lowest valley, both the transient and steady state transport behaviors of wurtzite InN show different transport characteristics in the two directions. From the relationship between velocity and electric field, the difference is more obvious when the electric field is low in the two directions. To make an accurate description of the anisotropic transport properties under low field, for the first time, we present an analytical model of anisotropic low-field electron mobility in wurtzite InN. The effects of different ionized impurity scattering models on the low-field mobility calculated by Monte Carlo method (Conwell-Weisskopf and Brooks-Herring method) are also considered.

  6. Growth mechanism, structure and IR photoluminescence studies of indium nitride nanorods

    NASA Astrophysics Data System (ADS)

    Lan, Z. H.; Wang, W. M.; Sun, C. L.; Shi, S. C.; Hsu, C. W.; Chen, T. T.; Chen, K. H.; Chen, C. C.; Chen, Y. F.; Chen, L. C.

    2004-08-01

    High-quality single crystal indium nitride nanorods were grown on Si substrates by catalytic chemical vapor deposition. Both Raman and high resolution transmission electron microscopic analyses suggested that even a minute amount of oxygen, from the residual oxygen in the growth environment and/or native oxide on the Si, would effectively help the growth of InN nanorods. The In 2O 3 formed on Au nanoparticles helped dissolve nitrogen as a catalyst with the subsequent growth of InN nanorods. Variations in the apparent color and photoluminescence (PL) spectra of the InN nanorods were observed. For the optically brown InN nanorods that exhibited diameters in the range of 30-50 nm, the PL study showed a peak at 1.9 eV, the possible origins of which are discussed. In contrast, for the optically black InN nanorods that exhibited diameters in the range of 50-100 nm, the PL peak at approximately 0.766 eV measured at 20 K was attributed to band edge emission.

  7. Carrier multiplication in bulk indium nitride

    NASA Astrophysics Data System (ADS)

    Jensen, S. A.; Versluis, J.; Cánovas, E.; Pijpers, J. J. H.; Sellers, I. R.; Bonn, M.

    2012-11-01

    Carrier multiplication (CM) is the process of generating multiple electron-hole pairs from one absorbed photon. Narrow-gap InN is a material that has been proposed for achieving efficient CM. We quantify the CM efficiency in bulk InN using terahertz time-domain spectroscopy. While the CM onset occurs at relatively low photon energies in InN (1.7 ± 0.2 eV), corresponding to 2.7 ± 0.3 times its bandgap, the excitation efficiency above the onset increases linearly with a slope of only ˜13%/Eg. Based on these numbers, the efficiency increase of an InN based photovoltaic device owing to CM is limited to maximum 1% point.

  8. Development of a Computational Chemical Vapor Deposition Model: Applications to Indium Nitride and Dicyanovinylaniline

    NASA Technical Reports Server (NTRS)

    Cardelino, Carlos

    1999-01-01

    A computational chemical vapor deposition (CVD) model is presented, that couples chemical reaction mechanisms with fluid dynamic simulations for vapor deposition experiments. The chemical properties of the systems under investigation are evaluated using quantum, molecular and statistical mechanics models. The fluid dynamic computations are performed using the CFD-ACE program, which can simulate multispecies transport, heat and mass transfer, gas phase chemistry, chemistry of adsorbed species, pulsed reactant flow and variable gravity conditions. Two experimental setups are being studied, in order to fabricate films of: (a) indium nitride (InN) from the gas or surface phase reaction of trimethylindium and ammonia; and (b) 4-(1,1)dicyanovinyl-dimethylaminoaniline (DCVA) by vapor deposition. Modeling of these setups requires knowledge of three groups of properties: thermodynamic properties (heat capacity), transport properties (diffusion, viscosity, and thermal conductivity), and kinetic properties (rate constants for all possible elementary chemical reactions). These properties are evaluated using computational methods whenever experimental data is not available for the species or for the elementary reactions. The chemical vapor deposition model is applied to InN and DCVA. Several possible InN mechanisms are proposed and analyzed. The CVD model simulations of InN show that the deposition rate of InN is more efficient when pulsing chemistry is used under conditions of high pressure and microgravity. An analysis of the chemical properties of DCVA show that DCVA dimers may form under certain conditions of physical vapor transport. CVD simulations of the DCVA system suggest that deposition of the DCVA dimer may play a small role in the film and crystal growth processes.

  9. Effect of strain on indium incorporation in heteroepitaxial (indium, gallium) nitride nanomaterials

    NASA Astrophysics Data System (ADS)

    Ewoldt, David A.

    2011-12-01

    One of the challenges facing LED lighting today is the achievement of low-cost true white lighting. Ideally, multiple LEDs of different colors, blue, red and green, would be utilized in order to achieve white light. Currently, the quality of green LEDs is low when compared to the red and blue counterparts. Green emission from LEDs is difficult to achieve due to phase segregation that occurs during growth of the (In,Ga)N LED structure, which separates into compositions of high and low InN concentration and prevents the moderate composition required for green emission. On the nanoscale, strain effects in the (In,Ga)N material system give rise to shifts in optical properties. Relieving strain allows for the incorporation of additional indium nitride, which shifts the wavelength of light emitted by the structure. In order to control strain effects, growth templates were fabricated by several methods (PAA, FIB, EBL). A robust process for fabrication of pores down to 25 nm in diameter has been developed in order to investigate this effect. From this process, a template using e-beam lithography has been created and then growth of (In,Ga)N on this template in a metallorganic chemical vapor deposition system was performed. As (In,Ga)N grows from the GaN substrate, it is naturally strained due to the lattice mismatch. Lateral growth out of the templates relieves strain by allowing the rods to expand as they grow out of the prepared pores. The effect of the diameter of pores on the emission characteristics has been analyzed and a strong logarithmic trend was discovered correlating emission wavelength to pore diameter. In addition to allowing control over the wavelength of emission based on pore diameter, the process that has been developed and demonstrated will allow a distribution of pore sizes that could facilitate color mixing.

  10. Indium nitride: A narrow gap semiconductor

    SciTech Connect

    Wu, J.; Walukiewicz, W.; Yu, K.M.; Ager III, J.W.; Haller, E.E.; Lu, H.; Schaff, W.J.

    2002-08-14

    The optical properties of wurtzite InN grown on sapphire substrates by molecular-beam epitaxy have been characterized by optical absorption, photoluminescence, and photomodulated reflectance techniques. All these three characterization techniques show an energy gap for InN between 0.7 and 0.8 eV, much lower than the commonly accepted value of 1.9 eV. The photoluminescence peak energy is found to be sensitive to the free electron concentration of the sample. The peak energy exhibits a very weak hydrostatic pressure dependence and a small, anomalous blueshift with increasing temperature. The bandgap energies of In-rich InGaN alloys were found to be consistent with the narrow gap of InN. The bandgap bowing parameter was determined to be 1.43 eV in InGaN.

  11. Effect of polarization field on mean free path of phonons in indium nitride

    NASA Astrophysics Data System (ADS)

    Sahoo, Sushant Kumar

    2016-05-01

    The effect of built-in-polarization field on mean free path of acoustic phonons in bulk wurtzite indium nitride (InN) has been theoretically investigated. The elastic constant of the material gets modified due to the existence of polarization field. As a result velocity and Debye frequency of phonons get enhanced. The various scattering rates of phonons are suppressed by the effect of polarization field, which implies an enhanced combined relaxation time. Thus phonons travel freely for a longer distance between two successive scatterings. This would enhance the thermal transport properties of the material when built-in-polarization field taken into account. Hence by the application of electric field the transport properties of such materials can be controlled as and when desired.

  12. Development of an Advanced Computational Model for OMCVD of Indium Nitride

    NASA Technical Reports Server (NTRS)

    Cardelino, Carlos A.; Moore, Craig E.; Cardelino, Beatriz H.; Zhou, Ning; Lowry, Sam; Krishnan, Anantha; Frazier, Donald O.; Bachmann, Klaus J.

    1999-01-01

    An advanced computational model is being developed to predict the formation of indium nitride (InN) film from the reaction of trimethylindium (In(CH3)3) with ammonia (NH3). The components are introduced into the reactor in the gas phase within a background of molecular nitrogen (N2). Organometallic chemical vapor deposition occurs on a heated sapphire surface. The model simulates heat and mass transport with gas and surface chemistry under steady state and pulsed conditions. The development and validation of an accurate model for the interactions between the diffusion of gas phase species and surface kinetics is essential to enable the regulation of the process in order to produce a low defect material. The validation of the model will be performed in concert with a NASA-North Carolina State University project.

  13. The InN epitaxy via controlling In bilayer

    PubMed Central

    2014-01-01

    The method of In bilayer pre-deposition and penetrated nitridation had been proposed, which had been proven to have many advantages theoretically. To study the growth behavior of this method experimentally, various pulse times of trimethylindium supply were used to get the optimal indium bilayer controlling by metalorganic vapour phase epitaxy. The results revealed that the InN film quality became better as the thickness of the top indium atomic layers was close to bilayer. A following tuning of nitridation process enhanced the quality of InN film further, which means that a moderate, stable, and slow nitridation process by NH3 flow also plays the key role in growing better-quality InN film. Meanwhile, the biaxial strain of InN film was gradually relaxing when the flatness was increasingly improved. PMID:24393422

  14. Impact of substrate nitridation on the growth of InN on In2O3(111) by plasma-assisted molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Cho, YongJin; Sadofev, Sergey; Fernández-Garrido, Sergio; Calarco, Raffaella; Riechert, Henning; Galazka, Zbigniew; Uecker, Reinhard; Brandt, Oliver

    2016-04-01

    We study the growth of InN films on In2O3(111) substrates by plasma-assisted molecular beam epitaxy under N excess. InN films deposited directly on In2O3(111) exhibit a strongly faceted morphology. A nitridation step prior to growth is found to convert the In2O3(111) surface to InN{0001}. The morphology of InN films deposited on such nitridated In2O3(111) substrates is characteristic for growth by instable step-flow and is thus drastically different from the three-dimensional growth obtained without nitridation. We show that this change originates from the different polarity of the films: while InN films deposited directly on In2O3(111) are In-polar, they are N-polar when grown on the nitridated substrate.

  15. Superconductivity of Ca2 InN with a layered structure embedding an anionic indium chain array

    NASA Astrophysics Data System (ADS)

    Jeong, Sehoon; Matsuishi, Satoru; Lee, Kimoon; Toda, Yoshitake; Wng Kim, Sung; Hosono, Hideo

    2014-05-01

    We report the emergence of superconductivity in Ca2InN consisting of a two-dimensional (2D) array of zigzag indium chains embedded between Ca2N layers. A sudden drop of resistivity and a specific heat (Cp) jump attributed to the superconducting transition were observed at 0.6 K. The Sommerfeld coefficient γ = 4.24 mJ mol-1K-2 and Debye temperature ΘD = 322 K were determined from the Cp of the normal conducting state and the superconducting volume fraction was estimated to be ˜80% from the Cp jump, assuming a BCS-type weak coupling. Density functional theory calculations demonstrated that the electronic bands near the Fermi level (EF) are mainly derived from In 5p orbitals with π and σ bonding states and the Fermi surface is composed of cylindrical parts, corresponding to the quasi-2D electronic state of the In-chain array. By integrating the projected density of states of the In-p component up to EF, a valence electron population of ˜1.6 electrons/In was calculated, indicating that partially anionic state of In. The In 3d binding energies observed in Ca2InN by x-ray photoemission spectroscopy were negatively shifted from that in In metal. The superconductivity of Ca2InN is associated with the p-p bonding states of the anionic In layer.

  16. Surface origin and control of resonance Raman scattering and surface band gap in indium nitride

    NASA Astrophysics Data System (ADS)

    Alarcón-Lladó, Esther; Brazzini, Tommaso; Ager, Joel W.

    2016-06-01

    Resonance Raman scattering measurements were performed on indium nitride thin films under conditions where the surface electron concentration was controlled by an electrolyte gate. As the surface condition is tuned from electron depletion to accumulation, the spectral feature at the expected position of the (E 1, A 1) longitudinal optical (LO) near 590 cm‑1 shifts to lower frequency. The shift is reversibly controlled with the applied gate potential, which clearly demonstrates the surface origin of this feature. The result is interpreted within the framework of a Martin double resonance, where the surface functions as a planar defect, allowing the scattering of long wavevector phonons. The allowed wavevector range, and hence the frequency, is modulated by the electron accumulation due to band gap narrowing. A surface band gap reduction of over 500 meV is estimated for the conditions of maximum electron accumulation. Under conditions of electron depletion, the full InN bandgap (E g  =  0.65 eV) is expected at the surface. The drastic change in the surface band gap is expected to influence the transport properties of devices which utilize the surface electron accumulation layer.

  17. Low-threshold indium gallium nitride quantum dot microcavity lasers

    NASA Astrophysics Data System (ADS)

    Woolf, Alexander J.

    Gallium nitride (GaN) microcavities with embedded optical emitters have long been sought after as visible light sources as well as platforms for cavity quantum electrodynamics (cavity QED) experiments. Specifically, materials containing indium gallium nitride (InGaN) quantum dots (QDs) offer an outstanding platform to study light matter interactions and realize practical devices, such as on-chip light emitting diodes and nanolasers. Inherent advantages of nitride-based microcavities include low surface recombination velocities, enhanced room-temperature performance (due to their high exciton binding energy, as high as 67 meV for InGaN QDs), and emission wavelengths in the blue region of the visible spectrum. In spite of these advantages, several challenges must be overcome in order to capitalize on the potential of this material system. Such diffculties include the processing of GaN into high-quality devices due to the chemical inertness of the material, low material quality as a result of strain-induced defects, reduced carrier recombination effciencies due to internal fields, and a lack of characterization of the InGaN QDs themselves due to the diffculty of their growth and therefore lack of development relative to other semiconductor QDs. In this thesis we seek to understand and address such issues by investigating the interaction of light coupled to InGaN QDs via a GaN microcavity resonator. Such coupling led us to the demonstration of the first InGaN QD microcavity laser, whose performance offers insights into the properties and current limitations of the nitride materials and their emitters. This work is organized into three main sections. Part I outlines the key advantages and challenges regarding indium gallium nitride (InGaN) emitters embedded within gallium nitride (GaN) optical microcavities. Previous work is also discussed which establishes context for the work presented here. Part II includes the fundamentals related to laser operation, including the

  18. Band Offset Characterization of the Atomic Layer Deposited Aluminum Oxide on m-Plane Indium Nitride

    NASA Astrophysics Data System (ADS)

    Jia, Ye; Wallace, Joshua S.; Qin, Yueling; Gardella, Joseph A.; Dabiran, Amir M.; Singisetti, Uttam

    2016-04-01

    In this letter, we report the band offset characterization of the atomic layer deposited aluminum oxide on non-polar m-plane indium nitride grown by plasma-assisted molecular beam epitaxy by using x-ray photoelectron spectroscopy. The valence band offset between aluminum oxide and m-plane indium nitride was determined to be 2.83 eV. The Fermi level of indium nitride was 0.63 eV above valence band maximum, indicated a reduced band bending in comparison to polar indium nitride. The band gap of aluminum oxide was found to be to 6.7 eV, which gave a conduction band offset of 3.17 eV.

  19. Formation and Temperature Effect of InN Nanodots by PA-MBE via Droplet Epitaxy Technique.

    PubMed

    Chen, Hugo Juin-Yu; Yang, Dian-Long; Huang, Tseh-Wet; Yu, Ing-Song

    2016-12-01

    In this report, self-organized indium nitride nanodots have been grown on Si (111) by droplet epitaxy method and their density can reach as high as 2.83 × 10(11) cm(-2) for the growth at low temperature of 250 °C. Based on the in situ reflection high-energy electron diffraction, the surface condition, indium droplets, and the formation of InN nanodots are identified during the epitaxy. The X-ray photoelectron spectroscopy and photoluminescence measurements have shown the formation of InN nanodots as well. The growth mechanism of InN nanodots could be described via the characterizations of indium droplets and InN nanodots using scanning electron microscopy, atomic force microscopy, and transmission electron microscopy. The density of the InN nanodots was less than that of the In droplets due to the surface diffusion and desorption of atoms during the nitridation and annealing process. The average size and density of InN nanodots can be controlled by the substrate temperatures during the growth. For the growth at lower temperature, we obtained the higher density and smaller average size of InN nanodots. To minimize the total surface energy, the coarsening and some preferred orientations of InN nanodots were observed for the growth at high temperature. PMID:27142879

  20. Formation and Temperature Effect of InN Nanodots by PA-MBE via Droplet Epitaxy Technique

    NASA Astrophysics Data System (ADS)

    Chen, Hugo Juin-Yu; Yang, Dian-Long; Huang, Tseh-Wet; Yu, Ing-Song

    2016-05-01

    In this report, self-organized indium nitride nanodots have been grown on Si (111) by droplet epitaxy method and their density can reach as high as 2.83 × 1011 cm-2 for the growth at low temperature of 250 °C. Based on the in situ reflection high-energy electron diffraction, the surface condition, indium droplets, and the formation of InN nanodots are identified during the epitaxy. The X-ray photoelectron spectroscopy and photoluminescence measurements have shown the formation of InN nanodots as well. The growth mechanism of InN nanodots could be described via the characterizations of indium droplets and InN nanodots using scanning electron microscopy, atomic force microscopy, and transmission electron microscopy. The density of the InN nanodots was less than that of the In droplets due to the surface diffusion and desorption of atoms during the nitridation and annealing process. The average size and density of InN nanodots can be controlled by the substrate temperatures during the growth. For the growth at lower temperature, we obtained the higher density and smaller average size of InN nanodots. To minimize the total surface energy, the coarsening and some preferred orientations of InN nanodots were observed for the growth at high temperature.

  1. Investigation of indium gallium nitride facet-dependent nonpolar growth rates and composition for core-shell light-emitting diodes

    NASA Astrophysics Data System (ADS)

    Gîrgel, Ionut; Edwards, Paul R.; Le Boulbar, Emmanuel; Coulon, Pierre-Marie; Sahonta, Suman-Lata; Allsopp, Duncan W. E.; Martin, Robert W.; Humphreys, Colin J.; Shields, Philip A.

    2016-01-01

    Core-shell indium gallium nitride (InGaN)/gallium nitride (GaN) structures are attractive as light emitters due to the large nonpolar surface of rod-like cores with their longitudinal axis aligned along the c-direction. These facets do not suffer from the quantum-confined Stark effect that limits the thickness of quantum wells and efficiency in conventional light-emitting devices. Understanding InGaN growth on these submicron three-dimensional structures is important to optimize optoelectronic device performance. In this work, the influence of reactor parameters was determined and compared. GaN nanorods (NRs) with both {11-20} a-plane and {10-10} m-plane nonpolar facets were prepared to investigate the impact of metalorganic vapor phase epitaxy reactor parameters on the characteristics of a thick (38 to 85 nm) overgrown InGaN shell. The morphology and optical emission properties of the InGaN layers were investigated by scanning electron microscopy, transmission electron microscopy, and cathodoluminescence hyperspectral imaging. The study reveals that reactor pressure has an important impact on the InN mole fraction on the {10-10} m-plane facets, even at a reduced growth rate. The sample grown at 750°C and 100 mbar had an InN mole fraction of 25% on the {10-10} facets of the NRs.

  2. Observation of visible luminescence from indium nitride at room temperature

    SciTech Connect

    Guo, Q.X.; Tanaka, T.; Nishio, M.; Ogawa, H.; Pu, X.D.; Shen, W.Z.

    2005-06-06

    InN films were grown on sapphire substrates with AlN buffer layers by reactive sputtering. C-axis-oriented crystalline InN films with a wurtzite structure were confirmed by x-ray diffraction and Raman scattering. Strong photoluminescence (PL) at 1.87 eV, together with a clear absorption edge at 1.97 eV, was observed at room temperature, which clearly demonstrates that it is not accurate in the previous assignment of an {approx}0.7 eV fundamental band gap for intrinsic InN simply from PL and absorption data. The possible origin of the present large band gap was discussed in terms of the effects of oxygen and the Burstein-Moss shift.

  3. Indium gallium nitride/gallium nitride quantum wells grown on polar and nonpolar gallium nitride substrates

    NASA Astrophysics Data System (ADS)

    Lai, Kun-Yu

    Nonpolar (m-plane or a-plane) gallium nitride (GaN) is predicted to be a potential substrate material to improve luminous efficiencies of nitride-based quantum wells (QWs). Numerical calculations indicated that the spontaneous emission rate in a single In0.15Ga0.85N/GaN QW could be improved by ˜2.2 times if the polarization-induced internal field was avoided by epitaxial deposition on nonpolar substrates. A challenge for nonpolar GaN is the limited size (less than 10x10 mm2) of substrates, which was addressed by expansion during the regrowth by Hydride Vapor Phase Epitaxy (HVPE). Subsurface damage in GaN substrates were reduced by annealing with NH3 and N2 at 950°C for 60 minutes. It was additionally found that the variation of m-plane QWs' emission properties was significantly increased when the substrate miscut toward a-axis was increased from 0° to 0.1°. InGaN/GaN QWs were grown by Metalorganic Chemical Vapor Deposition (MOCVD) on c-plane and m-plane GaN substrates. The QWs were studied by cathodoluminescence spectroscopy with different incident electron beam probe currents (0.1 nA ˜ 1000 nA). Lower emission intensities and longer peak wavelengths from c-plane QWs were attributed to the Quantum-confined Stark Effect (QCSE). The emission intensity ratios of m-plane QWs to c-plane QWs decreased from 3.04 at 1 nA to 1.53 at 1000 nA. This was identified as the stronger screening effects of QCSE at higher current densities in c-plane QWs. To further investigate these effects in a fabricated structure, biased photoluminescence measurements were performed on m-plane InGaN/GaN QWs. The purpose was to detect the possible internal fields induced by the dot-like structure in the InGaN layer through the response of these internal fields under externally applied fields. No energy shifts of the QWs were observed, which was attributed to strong surface leakage currents.

  4. Optical, structural, and transport properties of indium nitride, indium gallium nitride alloys grown by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Khan, Neelam

    InGaN based, blue and green light emitting diodes (LEDs) have been successfully produced over the past decade. But the progress of these LEDs is often limited by the fundamental problems of InGaN such as differences in lattice constants, thermal expansion coefficients and physical properties between InN and GaN. This difficulty could be addressed by studying pure InN and InxGa 1-xN alloys. In this context Ga-rich InxGa1-xN (x ≤ 0.4) epilayers were grown by metal organic chemical vapor deposition (MOCVD). X-ray diffraction (XRD) measurements showed InxGa1-xN films with x= 0.37 had single phase. Phase separation occurred for x ˜ 0.4. To understand the issue of phase separation in Ga-rich InxGa 1-xN, studies on growth of pure InN and In-rich InxGa 1-xN alloys were carried out. InN and In-rich InxGa1-xN (x ˜ 0.97-0.40) epilayers were grown on AlN/Al2O3 templates. A Hall mobility of 1400 cm2/Vs with a carrier concentration of 7x1018cm -3 was observed for InN epilayers grown on AlN templates. Photoluminescence (PL) emission spectra revealed a band to band emission peak at ˜0.75 eV for InN. This peak shifted to 1.15 eV when In content was varied from 1.0 to 0.63 in In-rich InxGa1-xN epilayers. After growth parameter optimization of In-rich InxGa1-xN alloys with (x = 0.97-0.40) were successfully grown without phase separation. Effects of Mg doping on the PL properties of InN epilayers grown on GaN/Al 2O3 templates were investigated. An emission line at ˜ 0.76 eV, which was absent in undoped InN epilayers and was about 60 meV below the band edge emission peak at ˜ 0.82 eV, was observed to be the dominant emission in Mg-doped InN epilayers. PL peak position and the temperature dependent emission intensity corroborated each other and suggested that Mg acceptor level in InN is about 60 meV above the valance band maximum. Strain effects on the emission properties of InGaN/GaN multiple quantum wells (MQWs) were studied using a single blue LED wafer possessing a continuous

  5. Plasma deposited silicon nitride for indium phosphide encapsulation

    NASA Technical Reports Server (NTRS)

    Valco, G. J.; Kapoor, V. J.; Biedenbender, M. D.; Williams, W. D.

    1989-01-01

    The composition and the annealing characteristics of plasma-deposited silicon-nitride encapsulating films on the ion-implanted InP substrates were investigated, using two different substrate-cleaning procedures (organic solvents and HF or HIO3 solutions) prior to encapsulation. The effect of plasma deposition of silicon nitride on the InP substrates was assessed through the current-voltage characteristics of Schottky diodes. Results of XPS analyses showed that the cleaning procedure that employed HF solution left less oxygen on the InP surface than the procedure involving HIO3. No chemical interaction between the film and the substrate was observed before or after annealing.

  6. InN thin-film transistors fabricated on polymer sheets using pulsed sputtering deposition at room temperature

    NASA Astrophysics Data System (ADS)

    Lye, Khe Shin; Kobayashi, Atsushi; Ueno, Kohei; Ohta, Jitsuo; Fujioka, Hiroshi

    2016-07-01

    Indium nitride (InN) is potentially suitable for the fabrication of high performance thin-film transistors (TFTs) because of its high electron mobility and peak electron velocity. However, InN is usually grown using a high temperature growth process, which is incompatible with large-area and lightweight TFT substrates. In this study, we report on the room temperature growth of InN films on flexible polyimide sheets using pulsed sputtering deposition. In addition, we report on the fabrication of InN-based TFTs on flexible polyimide sheets and the operation of these devices.

  7. MOCVD growth of gallium nitride with indium surfactant

    NASA Astrophysics Data System (ADS)

    Won, Dong Jin

    In this thesis research, the effect of indium surfactant on Ga-polar and N-polar GaN films grown at 950 °C by MOCVD on various substrates such as Si-face SiC, bulk GaN, Si(111), and C-face SiC was studied to investigate the stress relaxation mechanism, structural, and optical properties of GaN films which were modified by the indium surfactant. The effect of indium surfactant on GaN films grown on SiC was studied first. In the 1.8 microm thick Ga-polar GaN films grown on lattice-mismatched Si-face SiC substrates utilizing indium surfactant at 950 °C, inverted hexagonal pyramid surface defects, so-called V-defects which consist of six (1011) planes, formed at threading dislocations on the GaN surface, which gave rise to the relaxation of compressive misfit stress in an elastic way. Simultaneously, enhanced surface mobility of Ga and N adatoms with indium surfactant lead to improved 2D growth, which may be contradictory to the formation of surface defects like V-defects. In order to find the driving force for V-defect formation in the presence of indium, a nucleation and growth model was developed, taking into consideration the strain, surface, and dislocation energies modified by indium surfactant. This model found that the V-defect formation can be energetically preferred since indium reduces the surface energy of the (1011) plane, which gives rise to the V-defect formation and growth that can overcome the energy barrier at the critical radius of the V-defect. These Ga-polar GaN films were found to be unintentionally doped with Si. Thus, an investigation into the effect of intentional Si doping at a constant TMIn flow rate on GaN films was also performed. Si turned out to be another important factor in the generation of V-defects because Si may be captured at the threading dislocation cores by forming Si -- N bonds, acting as a mask to locally prevent GaN growth. This behavior appeared to assist the initiation of the V-defect which enables V-defects to easily

  8. Influence of In-N Clusters on Band Gap Energy of Dilute Nitride In x Ga1‑x N y As1‑y

    NASA Astrophysics Data System (ADS)

    Zhao, Chuan-Zhen; Guo, Heng-Fei; Chen, Li-Ying; Tang, Chun-Xiao; Lu, Ke-Qing

    2016-05-01

    The In-N clusters form in the dilute nitride InxGa1‑xNyAs1‑y alloys after annealing. It is found that the formation of the In-N clusters not only raises the N levels lying above the conduction band minimum (CBM) of InGaAs, but also raises the N levels below the CBM of InGaAs, leading to the variation of the impurity-host interaction. The blueshift of the band gap energy is relative to the variation of the impurity-host interaction. In order to describe the blueshift of the band gap energy due to the formation of the In-N clusters, a model is developed. It is found that the model can describe the blueshift of the band gap energy well. In addition, it is found the blueshift of the band gap energy due to the atom interdiffusion at the interface can be larger than that due to the formation of the In-N clusters. Supported by the National Natural Science Foundation of China under Grant No. 61504094, Tinjin Research Program of Application Foundation and Advanced Technology under No. 15JCYBJC16300, and Tianjin City High School Science and Technology Fund Planning Project No. 20120609

  9. Electrochromic reaction of InN thin films

    SciTech Connect

    Asai, Nobuaki; Inoue, Yasushi; Sugimura, Hiroyuki; Takai, Osamu

    1999-06-01

    Electrochromic (EC) reaction of indium nitride (InN) films prepared by radio frequency (rf) ion plating was studied through their chemical bonding states and crystalline structures as measured by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. In addition, the pH dependence of the EC reaction was characterized. Color of the InN films became darker or lighter when the InN films were polarized anodically or cathodically, respectively, in a Na{sub 2}SO{sub 4} solution. Similar color changes were observed when pH of the Na{sub 2}SO{sub 43} solution was changed from 4.0 to 11.6. The color change at one unit of pH difference corresponded to the EC color change at a potential difference of 59 mV. From these results, H{sup +} and OH{sup {minus}} were confirmed to be active reactants in the EC reaction of the InN films. On the other hand, it was revealed from XPS and XRD results that the amount of hydroxides formed at the grain boundaries and the surface of the anodically polarized InN films was greater than that of the film polarized cathodically. Therefore, the electrochromism of the InN films was concluded to be governed by chemisorption of H{sup +} and OH{sup {minus}} at grain boundaries.

  10. Polycrystalline InN thin films prepared by ion-beam-assisted filtered cathodic vacuum arc technique

    NASA Astrophysics Data System (ADS)

    Ji, X. H.; Lau, S. P.

    2005-09-01

    We report on the fabrication of indium nitride (InN) thin films on silicon (1 0 0) substrates by radio frequency ion-beam-assisted filtered cathodic vacuum arc technique at low temperature. The effects of nitrogen ion energy on the structural properties of InN films have been investigated by X-ray diffraction and Raman spectroscopy. The InN films exhibit polycrystalline wurtzite structure. At nitrogen ion energy of 100 eV, the film shows preferred (0 0 0 2) orientation. The preferred orientation is changed to ( 1 0 1¯ 1) when the nitrogen ion energy is more than 100 eV. Three Raman-active optical phonons have been clearly identified and assigned to A 1(LO) at ˜588 cm -1, E22 at ˜490 cm -1 and A 1(TO) at ˜449 cm -1 of InN films, which confirmed the hexagonal structure of InN.

  11. p-type conduction in Zn-ion implanted InN films

    NASA Astrophysics Data System (ADS)

    Xie, W. M.; Y Xie, Q.; Zhu, H. P.; Wang, W.; Cai, H. L.; Zhang, F. M.; Wu, X. S.

    2015-06-01

    We report p-type conductivity in wurtzite indium nitride (InN) experimentally and theoretically. The as-deposited InN films are implanted with various doses of Zn ions. The Hall coefficient is positive for samples with doses of 2.5 ~ 10   ×   1014 ions cm-2 at low temperature and turns negative as the temperature increases. This notable sign change of the Hall coefficient confirms the existence of mobile holes in Zn-implanted InN. Moreover, first principle calculations indicate that Zn may be a more stable p-type dopant in InN than that of Mg and Ba because of its low ionization energy.

  12. Growth of Indium Gallium Nitride Nanorings via Metal Organic Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Zaidi, Zohair

    III-Nitride nanostructures have been an active area of research recently due to their ability to tune their optoelectronic properties. Thus far work has been done on InGaN quantum dots, nanowires, nanopillars, amongst other structures, but this research reports the creation of a new type of InGaN nanostructure, nanorings. Hexagonal InGaN nanorings were formed using Metal Organic Chemical Vapor Deposition through droplet epitaxy. The nanorings were thoroughly analyzed using x-ray diffraction, photoluminescence, electron microscopy, electron diffraction, and atomic force microscopy. Nanorings with high indium incorporation were achieved with indium content up to 50% that was then controlled using the growth time, temperature, In/Ga ratio and III/N ratio. The analysis showed that the nanoring shape is able to incorporate more indium than other nanostructures, due to the relaxing mechanism involved in the formation of the nanoring. The ideal conditions were determined to be growth of 30 second droplets with a growth time of 1 minute 30 seconds at 770 C to achieve the most well developed rings with the highest indium concentration.

  13. Tuning of the electronic and optical properties of single-layer indium nitride by strain and stress

    NASA Astrophysics Data System (ADS)

    Jalilian, Jaafar; Naseri, Mosayeb; Safari, Shima; Zarei, Mina

    2016-09-01

    Using first principles calculations, electronic and optical properties of indium nitride graphene-like structure have been studied under various stress and strain values. The results exhibit that this compound in the range of ±6 applied biaxial strain remains a direct band gap semiconductor. Also, exerting stress and strain reduces the energy band gap of the considered materials. The optical calculations illustrate that applying stress and strain on system results in blue and red shift in optical spectra. All obtained results presented that we can tune the optoelectronic properties of indium nitride by applying stress and strain.

  14. Chemical vapor deposition of m-plane and c-plane InN nanowires on Si (100) substrate

    NASA Astrophysics Data System (ADS)

    Rafique, Subrina; Han, Lu; Zhao, Hongping

    2015-04-01

    In this paper, synthesis of indium nitride (InN) nanowires (NWs) by chemical vapor deposition (CVD) is studied. InN NWs were synthesized via a vapor-liquid-solid (VLS) growth mechanism using high purity indium foil and ammonia as the source materials, and nitrogen as carrier gas. The mixture of nonpolar m-plane oriented and polar c-plane oriented tapered InN NWs is observed grown on top of Si (100) substrate. Energy dispersive spectroscopy (EDS) showed that the tips of the NWs are primarily consisted of Au and the rest of the NWs are consisted of indium (In) and nitrogen (N). High resolution scanning electron microscopy (HRSEM) revealed that the InN NWs have both triangular and hexagonal cross sections. Transmission electron microscopy (TEM) diffraction pattern showed that the NWs are high quality single crystals having wurtzite crystal structure. High resolution transmission electron microscopy (HRTEM) showed the growth directions of the InN NWs with triangular cross section are along <10-10> nonpolar m-plane orientation and the InN NWs with hexagonal cross section are along <0001> polar c-plane orientation.

  15. Hall effect and photoconductivity lifetime studies of gallium nitride, indium nitride, and mercury cadmium telluride

    NASA Astrophysics Data System (ADS)

    Swartz, Craig H.

    A deep understanding of both carrier recombination and transport is necessary for semiconductor engineering, particularly in defining the ultimate limits of performance for a given device before spending the resources to perfect its fabrication. Hall effect measurements utilizing a variable magnetic field are necessary to discriminate between conduction in epitaxial layers and conduction originating at the surface or at an interfacial layer. For thick hydride vapor phase epitaxy (HVPE) grown GaN, variable field Hall measurements revealed the presence of small but significant lower mobility surface and interface electrons which would otherwise lead to errors in interpreting the electrical properties. In addition, QMSA analysis of the measurements indicates that thick GaN samples contain a large spread in electron mobility values, most likely with depth. For molecular beam epitaxial InN, it was found that electrical measurements are affected by surface charge conduction, as well as the non-uniformity of mobility and carrier concentration with depth. Both of these effects mask the surprisingly high quality of the material close to the surface. Photoconductance lifetime and variable-magnetic-field Hall and transient measurements were performed on a series of undoped, In-doped and As-doped HgCdTe grown by MBE and MOCVD. N-type layers often significantly influence the interpretation of the electrical measurements. Even the best Low Wavelength Infrared (LWIR) n-type material still appears to be dominated by defect-related recombination, as intrinsic lifetimes calculated with full band structure can be well above those measured. Mid-Wavelength Infrared (MWIR) lifetimes increase somewhat with carrier concentration, as if the n-type doping process were passivating Schockley-Read-Hall (SRH) defects. P-type MWIR films lie mainly below the predicted values, and their relationship between concentration and lifetime is essentially unchanged by growth technique, indicating that a

  16. Identification of Raman-active phonon modes in oriented platelets of InN and polycrystalline InN

    NASA Astrophysics Data System (ADS)

    Dyck, J. S.; Kim, K.; Limpijumnong, S.; Lambrecht, W. R. L.; Kash, K.; Angus, J. C.

    2000-04-01

    We report on micro-Raman studies on both randomly oriented polycrystals and groups of oriented, faceted platelets of indium nitride grown from the melt at subatmospheric pressures. Phonon modes were assigned as A1TO=445, E1TO=472, E2(2)=488, and A1LO=588 cm-1. The FWHM of the E2(2) peak of 2.5 cm -1 is the narrowest reported to date for InN. The measured TO phonon frequencies were compared to those calculated from first principles and excellent agreement was found. The results are discussed in the context of previously reported Raman experiments on heteroepitaxial, and hence strained, layers of InN.

  17. ANALYSIS OF THE WATER-SPLITTING CAPABILITIES OF GALLIUM INDIUM PHOSPHIDE NITRIDE (GaInPN)

    SciTech Connect

    Head, J.; Turner, J.

    2007-01-01

    With increasing demand for oil, the fossil fuels used to power society’s vehicles and homes are becoming harder to obtain, creating pollution problems and posing hazard’s to people’s health. Hydrogen, a clean and effi cient energy carrier, is one alternative to fossil fuels. Certain semiconductors are able to harness the energy of solar photons and direct it into water electrolysis in a process known as photoelectrochemical water-splitting. P-type gallium indium phosphide (p-GaInP2) in tandem with GaAs is a semiconductor system that exhibits water-splitting capabilities with a solar-tohydrogen effi ciency of 12.4%. Although this material is effi cient at producing hydrogen through photoelectrolysis it has been shown to be unstable in solution. By introducing nitrogen into this material, there is great potential for enhanced stability. In this study, gallium indium phosphide nitride Ga1-yInyP1-xNx samples were grown using metal-organic chemical vapor deposition in an atmospheric-pressure vertical reactor. Photocurrent spectroscopy determined these materials to have a direct band gap around 2.0eV. Mott-Schottky analysis indicated p-type behavior with variation in fl atband potentials with varied frequencies and pH’s of solutions. Photocurrent onset and illuminated open circuit potential measurements correlated to fl atband potentials determined from previous studies. Durability analysis suggested improved stability over the GaInP2 system.

  18. Large area InN terahertz emitters based on the lateral photo-Dember effect

    SciTech Connect

    Wallauer, Jan Grumber, Christian; Walther, Markus; Polyakov, Vladimir; Iannucci, Robert; Cimalla, Volker; Ambacher, Oliver

    2015-09-14

    Large area terahertz emitters based on the lateral photo-Dember effect in InN (indium nitride) are presented. The formation of lateral photo-Dember currents is induced by laser-illumination through a microstructured metal cover processed onto the InN substrate, causing an asymmetry in the lateral photogenerated charge carrier distribution. Our design uses simple metal structures, which are produced by conventional two-dimensional micro-structuring techniques. Having favoring properties as a photo-Dember material InN is particularly well-suited as a substrate for our emitters. We demonstrate that the emission intensity of the emitters can be significantly influenced by the structure of the metal cover leaving room for improvement by optimizing the masking structures.

  19. The influence of random indium alloy fluctuations in indium gallium nitride quantum wells on the device behavior

    SciTech Connect

    Yang, Tsung-Jui; Wu, Yuh-Renn; Shivaraman, Ravi; Speck, James S.

    2014-09-21

    In this paper, we describe the influence of the intrinsic indium fluctuation in the InGaN quantum wells on the carrier transport, efficiency droop, and emission spectrum in GaN-based light emitting diodes (LEDs). Both real and randomly generated indium fluctuations were used in 3D simulations and compared to quantum wells with a uniform indium distribution. We found that without further hypothesis the simulations of electrical and optical properties in LEDs such as carrier transport, radiative and Auger recombination, and efficiency droop are greatly improved by considering natural nanoscale indium fluctuations.

  20. Indium gallium nitride/gallium nitride vacuum microelectronic cold cathodes: Piezoelectric surface barrier lowering

    NASA Astrophysics Data System (ADS)

    Underwood, Robert Douglas

    Vacuum microelectronic devices are electronic devices fabricated using microelectronic processing and using vacuum as a transport medium. The electron velocity in vacuum can be larger than in solid state, which allows higher frequency operation of vacuum devices compared to solid-state devices. The effectiveness of vacuum microelectronic devices relies on the realization of an efficient source of electrons supplied to the vacuum. Cold cathodes do not rely on thermal energy for the emission of electrons into vacuum. Cold cathodes based on field emission are the most common types of vacuum microelectronic cold cathode because they have a very high efficiency and high current density electron emission. Materials used to fabricate field emitters must have the properties of high electron concentration, low surface reactivity, resistance to sputtering by ions, high thermal conductivity, and a method of fabrication of uniform arrays of field emitters. The III--V nitride semiconductors possess these material properties and uniform arrays of GaN field emitter pyramids have been produced by selective area, self-limited metalorganic chemical vapor deposition. The first GaN field emitter arrays were fabricated and measured. Emission currents as large as 82 muA at 1100 V from 245,000 pyramids have been realized using an external anode, separated by 0.25 mm, to apply voltage bias. The operation voltage was reduced by the development of an integrated anode structure. The anode-cathode separation achievable with the integrated anode was in the range of 0.5--2.4 m. The turn-on voltages of these devices were reduced to the range of 175--435 V. The operation voltage of field emitter cathodes is related to the surface energy barrier, which for n-type semiconductors is the electron affinity. A new method to reduce the effective electron affinity using a piezoelectric dipole in an InGaN/GaN heterostructure has been proposed and tested. The piezoelectric field produced in the strained In

  1. Growth and fabrication of gallium nitride and indium gallium nitride-based optoelectronic devices

    NASA Astrophysics Data System (ADS)

    Berkman, Erkan Acar

    In this study, heteroepitaxial growth of III-Nitrides was performed by metalorganic chemical vapor deposition (MOCVD) technique on (0001) Al 2O3 substrates to develop GaN and InxGa1-x N based optoelectronic devices. Comprehensive experimental studies on emission and relaxation mechanisms of InxGa1-xN quantum wells (QWs) and InxGa 1-xN single layers were performed. The grown films were characterized by x-ray diffraction (XRD), Hall Effect measurements, photoluminescence measurements (PL) and transmission electron microscopy (TEM). An investigation on the effect of number and width of QWs on PL emission properties of InxGa 1-xN single QWs and multi-quantum wells (MQW) was conducted. The experimental results were explained by the developed theoretical bandgap model. The study on the single layer InxGa1-xN films within and beyond critical layer thickness (CLT) demonstrated that thick InxGa 1-xN films display simultaneous presence of strained and (partially) relaxed layers. The In incorporation into the lattice was observed to be dependent on the strain state of the film. The findings on InxGa1-xN QWs and single layers were implemented in the development of InxGa1-xN based LEDs and photodiodes, respectively. The as-grown samples were fabricated using conventional lithography techniques into various optoelectronic devices including long wavelength LEDs, dichromatic monolithic white LEDs, and p-i-n photodiodes. Emission from InxGa1-xN/GaN MQW LEDs at wavelengths as long as 625nm was demonstrated. This is one of the longest peak emission wavelengths reported for MOCVD grown InxGa1-xN MQW structures. Dichromatic white emission in LEDs was realized by utilizing two InGaN MQW active regions emitting at complementary wavelengths. InGaN p-i-n photodiodes operating at various regions of the visible spectrum tailored by the i-layer properties were developed. This was achieved by the novel approach of employing InxGa1-xN in all layers of the p-i-n photodiodes, enabling nearly

  2. Drift current dominated terahertz radiation from InN at low-density excitation

    NASA Astrophysics Data System (ADS)

    Lin, K. I.; Tsai, J. T.; Wang, T. S.; Hwang, J. S.; Chen, M. C.; Chi, G. C.

    2008-12-01

    This letter investigates the polarity of terahertz radiation from indium nitride (InN) excited by femtosecond optical pulses wherein a central wavelength of around 790nm is measured. The InN epilayers are grown by metalorganic chemical vapor deposition on sapphire and silicon substrates. The polarity of the terahertz radiation field from InN is opposite to that from p-InAs whose radiation mechanism is dominated by the photo-Dember effect indicating that the dominant radiation mechanism in InN is the drift current induced by the internal electric field at low-density excitation below 590nJ /cm2. The internal electric field consists of the surface accumulation field and the spontaneous polarization-induced electric field. In addition, since no azimuthal angle dependence of the terahertz radiation is observed, the optical rectification effect is ruled out. By comparing the wave forms of terahertz radiation from the front and the back of the InN sample grown on sapphire in reflection geometry, the N polarity of the InN sample is confirmed.

  3. Effect of strain on gallium nitride and gallium indium arsenide nitride growth and doping

    NASA Astrophysics Data System (ADS)

    G. S., Sudhir

    GaN and the related (Al,In)N materials are currently used in manufacturing optoelectronic and electronic devices. However, the efficiency of these devices is limited due to lack of high structural quality and of low resistive p-type GaN. The GaN thin films are under strain during growth due to the large lattice mismatch, thermal expansion difference, and low growth temperature. Developing a better understanding of the effect of strain on the properties of thin films is important in furthering our knowledge of thin film growth affecting the performance of III-nitride based devices. Pulsed laser deposition was used to grow thin films of AlN and GaN on sapphire substrates. It is shown that the structure and surface morphology of layers are controlled by the nitrogen partial pressure during the growth. Through these nitrogen pressure related effects, thin films with microstructure ranging from crystalline to amorphous can be produced. A minimal surface root mean square roughness of 0.7 nm for amorphous AlN is obtained which compares well with the substrate roughness of 0.5 nm. Incorporation of impurities changes the lattice constants of thin films of GaN deposited on basal plane sapphire by molecular beam epitaxy. Both Mg (1017 cm-3) and Zn (3 x 10 20 cm-3) doping were found to expand the c lattice parameter by +0.38 x 10-2 and +0.62 x 10 -2, respectively. Oxygen up to concentrations 9 x 10 21 cm-3 is shown to replace nitrogen in GaN thin films reducing the c parameter only by a small amount. Incorporation of Si leads to a large decrease of the c parameter, which can not be attributed to the different size of Ga and Si. It is suggested that doping alters the film stoichiometry by a predicted Fermi level dependence of defect formation energies and thereby, lattice parameters and stress. A proper buffer layer design is shown to increase the incorporation of Mg by two orders of magnitude Finally, the balance of lattice parameter change caused by dopant and native point

  4. Micro and nano-structured green gallium indium nitride/gallium nitride light-emitting diodes

    NASA Astrophysics Data System (ADS)

    Stark, Christoph J. M.

    Light-emitting diodes (LEDs) are commonly designed and studied based on bulk material properties. In this thesis different approaches based on patterns in the nano and micrometer length scale range are used to tackle low efficiency in the green spectral region, which is known as “green gap”. Since light generation and extraction are governed by microscopic processes, it is instructive to study LEDs with lateral mesa sizes scaled to the nanometer range. Besides the well-known case of the quantum size effect along the growth direction, a continuous lateral scaling could reveal the mechanisms behind the purported absence of a green gap in nanowire LEDs and the role of their extraction enhancement. Furthermore the possibility to modulate strain and piezoelectric polarization by post growth patterning is of practical interest, because the internal electric fields in conventional wurtzite GaN LEDs cause performance problems. A possible alternative is cubic phase GaN, which is free of built-in polarization fields. LEDs on cubic GaN could show the link between strong polarization fields and efficiency roll-off at high current densities, also known as droop. An additional problem for all nitride-based LEDs is efficient light extraction. For a planar GaN LED only roughly 8% of the generated light can be extracted. Novel lightextraction structures with extraction-favoring geometry can yield significant increase in light output power. To investigate the effect of scaling the mesa dimension, micro and nano-sized LED arrays of variable structure size were fabricated. The nano-LEDs were patterned by electron beam lithography and dry etching. They contained up to 100 parallel nano-stripe LEDs connected to one common contact area. The mesa width was varied over 1 μm, 200 nm, and 50 nm. These LEDs were characterized electrically and optically, and the peak emission wavelength was found to depend on the lateral structure size. An electroluminescence (EL) wavelength shift of 3 nm

  5. Auger recombination in InN from first principles

    NASA Astrophysics Data System (ADS)

    McAllister, Andrew; Kioupakis, Emmanouil

    Group-III Nitride materials are used in numerous electronic and optoelectronic devices including solid-state lighting, energy conversion, sensor technologies, and high-power electronics. Indium nitride in particular is interesting for fast electronics and optoelectronics in the infrared. Auger recombination is a non-radiative carrier recombination process that would limit the efficiency of these devices. The small band gap (0.7 eV) and the high intrinsic free-electron concentrations in InN possibly make Auger recombination particularly important in this material. We used first-principles computational methods to determine the Auger recombination rates in InN. Our results suggest that direct Auger recombination is dominant in this material and that phonon-assisted Auger processes are not as important as in wider-gap nitrides such as GaN. This research was supported by the National Science Foundation CAREER award through Grant No. DMR-1254314. Computational resources were provided by the DOE NERSC facility.

  6. Surface cleaning procedures for thin films of indium gallium nitride grown on sapphire

    NASA Astrophysics Data System (ADS)

    Douglass, K.; Hunt, S.; Teplyakov, A.; Opila, R. L.

    2010-12-01

    Surface preparation procedures for indium gallium nitride (InGaN) thin films were analyzed for their effectiveness for carbon and oxide removal as well as for the resulting surface roughness. Aqua regia (3:1 mixture of concentrated hydrochloric acid and concentrated nitric acid, AR), hydrofluoric acid (HF), hydrochloric acid (HCl), piranha solution (1:1 mixture of sulfuric acid and 30% H 2O 2) and 1:9 ammonium sulfide:tert-butanol were all used along with high temperature anneals to remove surface contamination. X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) were utilized to study the extent of surface contamination and surface roughness, respectively. The ammonium sulfide treatment provided the best overall removal of oxygen and carbon. Annealing over 700 °C after a treatment showed an even further improvement in surface contamination removal. The piranha treatment resulted in the lowest residual carbon, while the ammonium sulfide treatment leads to the lowest residual oxygen. AFM data showed that all the treatments decreased the surface roughness (with respect to as-grown specimens) with HCl, HF, (NH 4) 2S and RCA procedures giving the best RMS values (˜0.5-0.8 nm).

  7. Unusual strategies for using indium gallium nitride grown on silicon (111) for solid-state lighting

    PubMed Central

    Kim, Hoon-sik; Brueckner, Eric; Song, Jizhou; Li, Yuhang; Kim, Seok; Lu, Chaofeng; Sulkin, Joshua; Choquette, Kent; Huang, Yonggang; Nuzzo, Ralph G.; Rogers, John A.

    2011-01-01

    Properties that can now be achieved with advanced, blue indium gallium nitride light emitting diodes (LEDs) lead to their potential as replacements for existing infrastructure in general illumination, with important implications for efficient use of energy. Further advances in this technology will benefit from reexamination of the modes for incorporating this materials technology into lighting modules that manage light conversion, extraction, and distribution, in ways that minimize adverse thermal effects associated with operation, with packages that exploit the unique aspects of these light sources. We present here ideas in anisotropic etching, microscale device assembly/integration, and module configuration that address these challenges in unconventional ways. Various device demonstrations provide examples of the capabilities, including thin, flexible lighting “tapes” based on patterned phosphors and large collections of small light emitters on plastic substrates. Quantitative modeling and experimental evaluation of heat flow in such structures illustrates one particular, important aspect of their operation: small, distributed LEDs can be passively cooled simply by direct thermal transport through thin-film metallization used for electrical interconnect, providing an enhanced and scalable means to integrate these devices in modules for white light generation. PMID:21666096

  8. Pressure dependence of the refractive index in wurtzite and rocksalt indium nitride

    SciTech Connect

    Oliva, R.; Yamaguchi, T.; Nanishi, Y.

    2014-12-08

    We have performed high-pressure Fourier transform infrared reflectance measurements on a freestanding InN thin film to determine the refractive index of wurtzite InN and its high-pressure rocksalt phase as a function of hydrostatic pressure. From a fit to the experimental refractive-index curves including the effect of the high-energy optical gaps, phonons, free carriers, and the direct (fundamental) band-gap in the case of wurtzite InN, we obtain pressure coefficients for the low-frequency (electronic) dielectric constant ε{sub ∞}. Negative pressure coefficients of −8.8 × 10{sup −2 }GPa{sup −1} and −14.8 × 10{sup −2 }GPa{sup −1} are obtained for the wurtzite and rocksalt phases, respectively. The results are discussed in terms of the electronic band structure and the compressibility of both phases.

  9. Initial exploration of growth of InN by electrochemical solution growth.

    SciTech Connect

    Waldrip, Karen Elizabeth

    2010-02-01

    This report summarizes a brief and unsuccessful attempt to grow indium nitride via the electrochemical solution growth method and a modification thereof. Described in this report is a brief effort using a $50,000 LDRD award to explore the possibilities of applying the Electrochemical Solution Growth (ESG) technique to the growth of indium nitride (InN). The ability to grow bulk InN would be exciting from a scientific perspective, and a commercial incentive lies in the potential of extending the ESG technique to grow homogeneous, bulk alloys of In{sub x}Ga{sub 1-x}N for light emitting diodes (LEDs) operating in the green region of the spectrum. Indium nitride is the most difficult of the III-nitrides to grow due to its very high equilibrium vapor pressure of nitrogen1. It is several orders of magnitude higher than for gallium nitride or aluminum nitride. InN has a bandgap energy of 0.7eV, and achieving its growth in bulk for large area, high quality substrates would permit the fabrication of LEDs operating in the infrared. By alloying with GaN and AlN, the bulk material used as substrates would enable high efficiency emission wavelengths that could be tailored all the way through the deep ultraviolet. In addition, InN has been shown to have very high electronic mobilities (2700 cm{sup 2}/V s), making it a promising material for transistors and even terahertz emitters. Several attempts at synthesizing InN have been made by several groups. It was shown that metallic indium does not interact with unactivated nitrogen even at very high temperatures. Thus sets up an incompatibility between the precursors in all growth methods: a tradeoff between thermally activating the nitrogen-containing precursor and the low decomposition temperature of solid InN. We have been working to develop a novel growth technique that circumvents the difficulties of other bulk growth techniques by precipitating the column III nitrides from a solvent, such as a molten chloride salt, that

  10. Pillar Initiated Growth of High Indium Content Bulk Indium Gallium Nitride to Improve the Material Quality for Photonic Devices

    NASA Astrophysics Data System (ADS)

    McFelea, Heather Dale

    The goal of this research was to reduce dislocations and strain in high indium content bulk InGaN to improve quality for optical devices. In an attempt to achieve this goal, InGaN pillars were grown with compositions that matched the composition of the bulk InGaN grown on top. Pillar height and density were optimized to facilitate coalescence on top of the pillars. It was expected that dislocations within the pillars would bend to side facets, thereby reducing the dislocation density in the bulk overgrowth, however this was not observed. It was also expected that pillars would be completely relaxed at the interface with the substrate. It was shown that pillars are mostly relaxed, but not completely. Mechanisms are proposed to explain why threading dislocations did not bend and how complete relaxation may have been achieved by mechanisms outside of interfacial misfit dislocation formation. Phase separation was not observed by TEM but may be related to the limitations of the sample or measurements. High indium observed at facets and stacking faults could be related to the extra photoluminescence peaks measured. This research focused on the InGaN pillars and first stages of coalescence on top of the pillars, saving bulk growth and device optimization for future research.

  11. High-rate growth of InN films on fianite and sapphire substrates by metalorganic vapor phase epitaxy with plasma-assisted nitrogen activation

    NASA Astrophysics Data System (ADS)

    Buzynin, Yu. N.; Vodop'yanov, A. V.; Golubev, S. V.; Drozdov, M. N.; Drozdov, Yu. N.; Luk'yanov, A. Yu.; Mansfeld, D. A.; Khrykin, O. I.; Shashkin, V. I.; Yunin, P. A.

    2015-03-01

    Hexagonal single-crystalline indium nitride (InN) films on (0001)-oriented sapphire (Al2O3) and (111)-oriented fianite (yttria-stabilized zirconia, YSZ) substrates and on (0001)-oriented GaN/Al2O3 templates have been grown at a record high rate of 10 μm/h by the method of metalorganic vapor phase epitaxy with nitrogen activation in plasma of electron cyclotron resonance discharge generated by gyrotron radiation. It is established that the use of fianite substrates significantly improves the structural perfection and photoluminescent properties of InN films as compared to those grown on sapphire and templates. Undoped InN films exhibit n-type conductivity with electron concentrations within n = 8.0 × 1019-4.9 × 1020 cm-3 and room-temperature mobilities up to 180 cm2/(V s).

  12. Quantized Electron Accumulation States in Indium Nitride Studied by Angle-Resolved Photoemission Spectroscopy

    NASA Astrophysics Data System (ADS)

    Colakerol, Leyla; Veal, T. D.; Jeong, Hae-Kyung; Plucinski, Lukasz; Demasi, Alex; Learmonth, Timothy; Glans, Per-Anders; Wang, Shancai; Zhang, Yufeng; Piper, L. F. J.; Jefferson, P. H.; Fedorov, Alexei; Chen, Tai-Chou; Moustakas, T. D.; McConville, C. F.; Smith, Kevin E.

    2006-12-01

    Electron accumulation states in InN have been measured using high resolution angle-resolved photoemission spectroscopy (ARPES). The electrons in the accumulation layer have been discovered to reside in quantum well states. ARPES was also used to measure the Fermi surface of these quantum well states, as well as their constant binding energy contours below the Fermi level EF. The energy of the Fermi level and the size of the Fermi surface for these quantum well states could be controlled by varying the method of surface preparation. This is the first unambiguous observation that electrons in the InN accumulation layer are quantized and the first time the Fermi surface associated with such states has been measured.

  13. Self-Catalyzed Growth of Vertically Aligned InN Nanorods by Metal-Organic Vapor Phase Epitaxy.

    PubMed

    Tessarek, C; Fladischer, S; Dieker, C; Sarau, G; Hoffmann, B; Bashouti, M; Göbelt, M; Heilmann, M; Latzel, M; Butzen, E; Figge, S; Gust, A; Höflich, K; Feichtner, T; Büchele, M; Schwarzburg, K; Spiecker, E; Christiansen, S

    2016-06-01

    Vertically aligned hexagonal InN nanorods were grown mask-free by conventional metal-organic vapor phase epitaxy without any foreign catalyst. The In droplets on top of the nanorods indicate a self-catalytic vapor-liquid-solid growth mode. A systematic study on important growth parameters has been carried out for the optimization of nanorod morphology. The nanorod N-polarity, induced by high temperature nitridation of the sapphire substrate, is necessary to achieve vertical growth. Hydrogen, usually inapplicable during InN growth due to formation of metallic indium, and silane are needed to enhance the aspect ratio and to reduce parasitic deposition beside the nanorods on the sapphire surface. The results reveal many similarities between InN and GaN nanorod growth showing that the process despite the large difference in growth temperature is similar. Transmission electron microscopy, spatially resolved energy-dispersive X-ray spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and Raman spectroscopy have been performed to analyze the structural properties. Spatially resolved cathodoluminescence investigations are carried out to verify the optical activity of the InN nanorods. The InN nanorods are expected to be the material of choice for high-efficiency hot carrier solar cells. PMID:27187840

  14. Enhancement in c-Si solar cells using 16 nm InN nanoparticles

    NASA Astrophysics Data System (ADS)

    Imtiaz Chowdhury, Farsad; Alnuaimi, Aaesha; Alkis, Sabri; Ortaç, Bülend; Aktürk, Selçuk; Alevli, Mustafa; Dietz, Nikolaus; Kemal Okyay, Ali; Nayfeh, Ammar

    2016-05-01

    In this work, 16 nm indium nitride (InN) nanoparticles (NPs) are used to increase the performance of thin-film c-Si HIT solar cells. InN NPs were spin-coated on top of an ITO layer of c-Si HIT solar cells. The c-Si HIT cell is a stack of 2 μm p type c-Si, 4–5 nm n type a-Si, 15 nm n+ type a-Si and 80 nm ITO grown on a p+ type Si substrate. On average, short circuit current density (Jsc) increases from 19.64 mA cm‑2 to 21.54 mA cm‑2 with a relative improvement of 9.67% and efficiency increases from 6.09% to 7.09% with a relative improvement of 16.42% due to the presence of InN NPs. Reflectance and internal/external quantum efficiency (IQE/EQE) of the devices were also measured. Peak EQE was found to increase from 74.1% to 81.3% and peak IQE increased from 93% to 98.6% for InN NPs coated c-Si HIT cells. Lower reflection of light due to light scattering is responsible for performance enhancement between 400–620 nm while downshifted photons are responsible for performance enhancement from 620 nm onwards.

  15. Chemical nature of silicon nitride-indium phosphide interface and rapid thermal annealing for InP MISFETs

    NASA Technical Reports Server (NTRS)

    Biedenbender, M. D.; Kapoor, V. J.

    1990-01-01

    A rapid thermal annealing (RTA) process in pure N2 or pure H2 was developed for ion-implanted and encapsulated indium phosphide compound semiconductors, and the chemical nature at the silicon nitride-InP interface before and after RTA was examined using XPS. Results obtained from SIMS on the atomic concentration profiles of the implanted silicon in InP before and after RTA are presented, together with electrical characteristics of the annealed implants. Using the RTA process developed, InP metal-insulator semiconductor FETs (MISFETS) were fabricated. The MISFETS prepared had threshold voltages of +1 V, transconductance of 27 mS/mm, peak channel mobility of 1200 sq cm/V per sec, and drain current drift of only 7 percent.

  16. Phase separation and atomic ordering in indium gallium nitride epitaxial layers

    NASA Astrophysics Data System (ADS)

    Rao, Manu

    Phase separation and atomic ordering were investigated in InGaN layers grown by metalorganic chemical vapor deposition on (0001) sapphire substrates. Transmission electron microscopy (TEM) of InGaN layers during their early stages of growth reveal 2-D quantum rings that form spontaneously. In thick layers at InN contents of 3%, planview TEM images show a random distribution of atomic species and selected area diffraction (SAD) patterns do not exhibit satellite spots continuous to Bragg reflections. InN contents of 12% result in a speckled microstructure and satellites are present in SAD patterns. No satellites are observed along the [0001] direction, implying that phase separation is two-dimensional in nature and may occur on the surface while the layer is growing. These results are indicative of composition modulations lying in the (0001) growth plane. Samples containing InN fractions of between 22 and 34% exhibit microstructures having stronger contrast variations and SAD patterns with satellites further spaced from fundamental reflections. In cross-sectional TEM images, contrast striations oriented along [0001] are present except near the InGaN/GaN interface. The spacing of these striations is comparable to the composition modulation wavelengths calculated from SADPs and decreases with increasing InN content. Similarly, plan view TEM images taken from very thin specimens exhibit a domain structure with well aligned stripes within the domains. Increasing the growth rate from 400nm/h to 900nm/h results in a reduction in the intensity of satellite spots, indicating that the amplitude of composition modulations is reduced. The absence of contrast near the InGaN/GaN interface suggest reduced In incorporation, resulting in the absence of phase separation. Reduced In incorporation is confirmed by high angle angular dark field (HAADF) imaging and energy dispersive x-ray spectroscopy (EDS). X-ray diffraction and photoluminescence data are consistent with the occurrence

  17. Indium-zinc oxide transparent electrode for nitride-based light-emitting diodes

    NASA Astrophysics Data System (ADS)

    Mizutani, S.; Nakashima, S.; Iwaya, M.; Takeuchi, T.; Kamiyama, S.; Akasaki, I.; Kondo, T.; Teramae, F.; Suzuki, A.; Kitano, T.; Mori, M.; Matsubara, M.

    2013-03-01

    The basic properties of indium-zinc oxide (IZO) were investigated from the view point of the potential of light-emitting diodes (LEDs) for nanostructured transparent contact. The resistivity and contact resistance to p-GaN were obtained to be 2.5×10-4 Ωcm and 9.4×10-4 Ωcm2, respectively, which are comparable to those of indium-tin oxide (ITO). The light output of the LED with the moth-eye IZO was 10 % and 40 % higher than that of the LED with the moth-eye ITO and that of the LED without the moth-eye structure, respectively.

  18. Electron transport and electron energy distributions within the wurtzite and zinc-blende phases of indium nitride: Response to the application of a constant and uniform electric field

    SciTech Connect

    Siddiqua, Poppy; Hadi, Walid A.; Salhotra, Amith K.; O'Leary, Stephen K.; Shur, Michael S.

    2015-03-28

    Within the framework of an ensemble semi-classical three-valley Monte Carlo electron transport simulation approach, we critically contrast the nature of the electron transport that occurs within the wurtzite and zinc-blende phases of indium nitride in response to the application of a constant and uniform electric field. We use the electron energy distribution and its relationship with the electron transport characteristics in order to pursue this analysis. For the case of zinc-blende indium nitride, only a peak corresponding to the electrons within the lowest energy conduction band valley is observed, this peak being seen to broaden and shift to higher energies in response to increases in the applied electric field strength, negligible amounts of upper energy conduction band valley occupancy being observed. In contrast, for the case of wurtzite indium nitride, in addition to the aforementioned lowest energy conduction band valley peak in the electron energy distribution, and its broadening and shifting to higher energies in response to increases in the applied electric field strength, beyond a certain critical electric field strength, 30 kV/cm for the case of this particular material, upper energy conduction band valley occupancy is observed, this occupancy being further enhanced in response to further increases in the applied electric field strength. Reasons for these results are provided. The potential for device consequences is then commented upon.

  19. Think INN, prescribe INN, dispense INN: good professional practice.

    PubMed

    2000-12-01

    (1) International nonproprietary names (INN) for drugs were invented about fifty years ago, under the aegis of the World Health Organisation, to provide a common language for health professionals and patients worldwide. (2) No country forbids INN prescriptions. Some countries actively recommend using INNs. (3) INN prescription empowers prescribers and pharmacists in their choice of treatment. (4) The choice between a prescription based on the INN or the brand name will depend on the type of treatment (short term or chronic), the nature of the drug (especially its therapeutic margin) and any specific risks related to the patient (age, disease condition, allergy, and adherence). (5) A pharmacist's decision to dispense a brand name drug from an INN prescription must be based on usual dispensing precautions. (6) Adopting INN prescribing means having to reflect on one's knowledge of drugs, and to challenge the quality of one's initial and continuing education in pharmacology and therapeutics. The INN system is a means of improving prescribing and dispensing practices: it involves paying more attention to the patient, explaining the treatment in greater detail, and respecting his/her choice. PMID:11475502

  20. Theoretical Study of Indium Compounds of Interest for Organometallic Chemical Vapor Deposition

    NASA Technical Reports Server (NTRS)

    Cardelino, B. H.; Moore, C. E.; Cardelino, C. A.; Frazier, D. O.; Backmann, K. J.

    2000-01-01

    The structural. electronic and therinochemical properties of indium compounds which are of interest in halide transport and organometallic chemical vapor deposition processes have been studied by ab initio and statistical mechanics methods. The compounds reported include: indium halides and hydrides (InF, InCl, InCl3, InH, InH2, InH3); indium clusters (In2, In3); methylindium, dimethylindium, and their hydrogen derivatives [In(CH3), In(CH3)H, In(CH3)H2, In(CH3)2, In(CH3)2H]; dimethyl-indium dimer [In2(CH3)4], trimethyl-indium [In(CH3)3]; dehydrogenated methyl, dimethyl and trimethylindium [In(CH3)2CH2, In(CH3)CH2, In(CH2)], trimethylindium adducts with ammonia, trimethylamine and hydrazine [(CH3)3In:NH3, (CH3)3In:N(CH3)3, (CH3)3In:N(H2)N(H2)]; dimethylamino-indium and methylimino-indium [In(CH3)2(NH2), In(CH3)(NH)]; indium nitride and indium nitride dimer (InN, In2N2), indium phosphide, arsenide and antimonide ([InP, InAs, InSb). The predicted electronic properties are based on density functional theory calculations; the calculated thermodynamic properties are reported following the format of the JANAF (Joint Army, Navy, NASA, Air Force) Tables. Equilibrium compositions at two temperatures (298 and 1000 K) have been analyzed for groups of competing simultaneous reactions.

  1. Growth and characterizations of semipolar (1122) InN

    SciTech Connect

    Dinh, Duc V.; Skuridina, D.; Solopow, S.; Frentrup, M.; Pristovsek, M.; Vogt, P.; Kneissl, M.; Ivaldi, F.; Kret, S.; Szczepanska, A.

    2012-07-01

    We report on metal-organic vapor phase epitaxial growth of (1122) InN on (1122) GaN templates on m-plane (1010) sapphire substrates. The in-plane relationship of the (1122) InN samples is [1123]{sub InN} Double-Vertical-Line Double-Vertical-Line [0001]{sub sapphire} and [1100]{sub InN} Double-Vertical-Line Double-Vertical-Line [1210]{sub sapphire}, replicating the in-plane relationship of the (1122) GaN templates. The surface of the (1122) InN samples and the (1122) GaN templates shows an undulation along [1100]{sub InN,GaN}, which is attributed to anisotropic diffusion of indium/gallium atoms on the (1122) surfaces. The growth rate of the (1122) InN layers was 3-4 times lower compared to c-plane (0001) InN. High resolution transmission electron microscopy showed a relaxed interface between the (1122) InN layers and the (1122) GaN templates, consistent with x-ray diffraction results. Basal plane stacking faults were found in the (1122) GaN templates but they were terminated at the InN/(1122) GaN interface due to the presence of misfit dislocations along the entire InN/GaN interface. The misfit dislocations were contributed to the fully relaxation and the tilts of the (1122) InN layers. X-ray photoelectron spectroscopy was used to determine the polarity of the grown (1122) InN sample, indicating an In-polar (1122) InN. The valence band maximum was determined to be at (1.7 {+-} 0.1) eV for the (1122) InN sample, comparable to In-polar c-plane InN.

  2. High Active Nitrogen Flux Growth of (Indium) Gallium Nitride by Plasma Assisted Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    McSkimming, Brian Matthew

    Plasma-assisted molecular beam epitaxy (PAMBE) growth of gallium nitride (GaN) has evolved over the past two decades due to progress in growth science and in the active nitrogen plasma source hardware. The transition from electron cyclotron resonance (ECR) microwave plasma sources to radio frequency (RF) plasma sources has enabled higher growth rates, reduced ion damage and improved operation at higher growth chamber pressures. Even with further improvements in RF plasma sources, PAMBE has remained primarily a research tool partially due to limitations in material growth rates. This dissertation presents results based upon two modifications of a commercially available nitrogen plasma source. These modifications have resulted in record active nitrogen fluxes, and therefore record growth rates of more than 7.6 mum/h. For optimized growth conditions in the standard metal-rich growth regime, the surfaces displayed a clear step-terrace structure with an average RMS roughness (3 mumx3 mum) on the order of 1 nm. Secondary ion mass spectroscopy (SIMS) impurity analysis demonstrates unintentional oxygen incorporation of ˜1x1016, comparable to the metal organic chemical vapor deposition (MOCVD) grown template layer. Additionally, a revised universal growth diagram is proposed allowing the rapid determination of the metal flux needed to grow in a specific growth regime for any and all active nitrogen fluxes available. High temperature nitrogen rich PAMBE growth of GaN has been previously demonstrated as a viable alternative to the challenges presented in maintaining the Ga bilayer required by metal rich growth of GaN. This dissertation also present results demonstrating PAMBE growth of GaN at a substrate temperature more than 150 °C greater than our standard Ga rich GaN growth regime and ˜100 °C greater than any previously reported PAMBE growth of GaN. Finally, a revised growth diagram is proposed highlighting a large growth window available at high temperatures.

  3. Observation of Room Temperature Ferromagnetism in InN Nanostructures.

    PubMed

    Roul, Basanta; Kumar, Mahesh; Bhat, Thirumaleshwara N; Rajpalke, Mohana K; Krupanidhi, S B; Kumar, Nitesh; Sundaresan, A

    2015-06-01

    The room temperature ferromagnetic behavior of InN nanostructures grown by molecular beam epitaxy (MBE) is explored by means of magnetization measurements. The saturation magnetization and remanent magnetization are found to be strongly dependent on the size of the nanostructures. This suggests that the ferromagnetism is essentially confined to the surface of the nanostructures due to the possible defects. Raman spectroscopy shows the existence of indium vacancies which could be the source of ferromagnetic ordering in InN nanostructures. PMID:26369060

  4. 15. LOOKING WEST TOWARD OLD FAITHFUL INN. THE INN'S NAMESAKE, ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    15. LOOKING WEST TOWARD OLD FAITHFUL INN. THE INN'S NAMESAKE, OLD FAITHFUL GEYSER IS AT LEFT. - Old Faithful Inn, 900' northeast of Snowlodge & 1050' west of Old Faithful Lodge, Lake, Teton County, WY

  5. A Sub-ppm Acetone Gas Sensor for Diabetes Detection Using 10 nm Thick Ultrathin InN FETs

    PubMed Central

    Kao, Kun-Wei; Hsu, Ming-Che; Chang, Yuh-Hwa; Gwo, Shangjr; Yeh, J. Andrew

    2012-01-01

    An indium nitride (InN) gas sensor of 10 nm in thickness has achieved detection limit of 0.4 ppm acetone. The sensor has a size of 1 mm by 2.5 mm, while its sensing area is 0.25 mm by 2 mm. Detection of such a low acetone concentration in exhaled breath could enable early diagnosis of diabetes for portable physiological applications. The ultrathin InN epilayer extensively enhances sensing sensitivity due to its strong electron accumulation on roughly 5–10 nm deep layers from the surface. Platinum as catalyst can increase output current signals by 2.5-fold (94 vs. 37.5 μA) as well as reduce response time by 8.4-fold (150 vs. 1,260 s) in comparison with bare InN. More, the effect of 3% oxygen consumption due to breath inhalation and exhalation on 2.4 ppm acetone gas detection was investigated, indicating that such an acetone concentration can be analyzed in air. PMID:22969342

  6. Auger recombination as the dominant recombination process in indium nitride at low temperatures during steady-state photoluminescence

    SciTech Connect

    Seetoh, I. P.; Soh, C. B.; Fitzgerald, E. A.; Chua, S. J.

    2013-03-11

    Auger recombination in InN films grown by metal-organic chemical vapor deposition was studied by steady-state photoluminescence at different laser excitation powers and sample temperatures. It was dominant over radiative recombination and Shockley-Read-Hall recombination at low temperatures, contributing to the sub-linear relationship between the integrated photoluminescence intensity and laser excitation power. Auger recombination rates increased gradually with temperature with an activation energy of 10-17 meV, in good agreement with values from transient photoluminescence reported in literature. As the Auger recombination rates were independent of material quality, they may form an upper limit to the luminous efficiency of InN.

  7. Auger recombination as the dominant recombination process in indium nitride at low temperatures during steady-state photoluminescence

    NASA Astrophysics Data System (ADS)

    Seetoh, I. P.; Soh, C. B.; Fitzgerald, E. A.; Chua, S. J.

    2013-03-01

    Auger recombination in InN films grown by metal-organic chemical vapor deposition was studied by steady-state photoluminescence at different laser excitation powers and sample temperatures. It was dominant over radiative recombination and Shockley-Read-Hall recombination at low temperatures, contributing to the sub-linear relationship between the integrated photoluminescence intensity and laser excitation power. Auger recombination rates increased gradually with temperature with an activation energy of 10-17 meV, in good agreement with values from transient photoluminescence reported in literature. As the Auger recombination rates were independent of material quality, they may form an upper limit to the luminous efficiency of InN.

  8. Electronic and thermoelectric properties of InN studied using ab initio density functional theory and Boltzmann transport calculations

    SciTech Connect

    Borges, P. D. E-mail: lscolfaro@txstate.edu; Scolfaro, L. E-mail: lscolfaro@txstate.edu

    2014-12-14

    The thermoelectric properties of indium nitride in the most stable wurtzite phase (w-InN) as a function of electron and hole concentrations and temperature were studied by solving the semiclassical Boltzmann transport equations in conjunction with ab initio electronic structure calculations, within Density Functional Theory. Based on maximally localized Wannier function basis set and the ab initio band energies, results for the Seebeck coefficient are presented and compared with available experimental data for n-type as well as p-type systems. Also, theoretical results for electric conductivity and power factor are presented. Most cases showed good agreement between the calculated properties and experimental data for w-InN unintentionally and p-type doped with magnesium. Our predictions for temperature and concentration dependences of electrical conductivity and power factor revealed a promising use of InN for intermediate and high temperature thermoelectric applications. The rigid band approach and constant scattering time approximation were utilized in the calculations.

  9. Smooth e-beam-deposited tin-doped indium oxide for III-nitride vertical-cavity surface-emitting laser intracavity contacts

    NASA Astrophysics Data System (ADS)

    Leonard, J. T.; Cohen, D. A.; Yonkee, B. P.; Farrell, R. M.; DenBaars, S. P.; Speck, J. S.; Nakamura, S.

    2015-10-01

    We carried out a series of simulations analyzing the dependence of mirror reflectance, threshold current density, and differential efficiency on the scattering loss caused by the roughness of tin-doped indium oxide (ITO) intracavity contacts for 405 nm flip-chip III-nitride vertical-cavity surface-emitting lasers (VCSELs). From these results, we determined that the ITO root-mean-square (RMS) roughness should be <1 nm to minimize scattering losses in VCSELs. Motivated by this requirement, we investigated the surface morphology and optoelectronic properties of electron-beam (e-beam) evaporated ITO films, as a function of substrate temperature and oxygen flow and pressure. The transparency and conductivity were seen to increase with increasing temperature. Decreasing the oxygen flow and pressure resulted in an increase in the transparency and resistivity. Neither the temperature, nor oxygen flow and pressure series on single-layer ITO films resulted in highly transparent and conductive films with <1 nm RMS roughness. To achieve <1 nm RMS roughness with good optoelectronic properties, a multi-layer ITO film was developed, utilizing a two-step temperature scheme. The optimized multi-layer ITO films had an RMS roughness of <1 nm, along with a high transparency (˜90% at 405 nm) and low resistivity (˜2 × 10-4 Ω-cm). This multi-layer ITO e-beam deposition technique is expected to prevent p-GaN plasma damage, typically observed in sputtered ITO films on p-GaN, while simultaneously reducing the threshold current density and increasing the differential efficiency of III-nitride VCSELs.

  10. Plasma-deposited germanium nitride gate insulators for indium phosphide metal-insulator-semiconductor field-effect transistors

    NASA Technical Reports Server (NTRS)

    Johnson, Gregory A.; Kapoor, Vik J.

    1991-01-01

    Plasma-deposited germanium nitride was investigated for the first time as a possible gate insulator for InP compound semiconductor metal-insulator-semiconductor FET (MISFET) technology. The germanium nitride films were successfully deposited in a capacitively coupled parallel plate reactor at 13.56 MHz operation using GeH4/N2/NH3 and GeH4/N2 mixtures as reactant gases. The former process produced better quality films with enhanced uniformity, increased deposition rates, and increased resistivity. The breakdown field strength of the films was greater than 10 to the 6th V/cm. Auger electron spectroscopy did not indicate significant chemical composition differences between the two processes. For MISFETs with 2-micron channel lengths fabricated on InP, the device transconductance and threshold voltage for the GeH4/N2/NH3 process were 17 mS/mm and -3.6 V, respectively. The drain-source breakdown voltages were greater than 10 V.

  11. InN Quantum Dot Based Infra-Red Photodetectors.

    PubMed

    Shetty, Arjun; Kumar, Mahesh; Roull, Basanta; Vinoy, K J; Krupanidhj, S B

    2016-01-01

    Self-assembled InN quantum dots (QDs) were grown on Si(111) substrate using plasma assisted molecular beam epitaxy (PA-MBE). Single-crystalline wurtzite structure of InN QDs was confirmed by X-ray diffraction. The dot densities were varied by varying the indium flux. Variation of dot density was confirmed by FESEM images. Interdigitated electrodes were fabricated using standard lithog- raphy steps to form metal-semiconductor-metal (MSM) photodetector devices. The devices show strong infrared response. It was found that the samples with higher density of InN QDs showed lower dark current and higher photo current. An explanation was provided for the observations and the experimental results were validated using Silvaco Atlas device simulator. PMID:27398511

  12. Crystallinity, Surface Morphology, and Photoelectrochemical Effects in Conical InP and InN Nanowires Grown on Silicon.

    PubMed

    Parameshwaran, Vijay; Xu, Xiaoqing; Clemens, Bruce

    2016-08-24

    The growth conditions of two types of indium-based III-V nanowires, InP and InN, are tailored such that instead of yielding conventional wire-type morphologies, single-crystal conical structures are formed with an enlarged diameter either near the base or near the tip. By using indium droplets as a growth catalyst, combined with an excess indium supply during growth, "ice cream cone" type structures are formed with a nanowire "cone" and an indium-based "ice cream" droplet on top for both InP and InN. Surface polycrystallinity and annihilation of the catalyst tip of the conical InP nanowires are observed when the indium supply is turned off during the growth process. This growth design technique is extended to create single-crystal InN nanowires with the same morphology. Conical InN nanowires with an enlarged base are obtained through the use of an excess combined Au-In growth catalyst. Electrochemical studies of the InP nanowires on silicon demonstrate a reduction photocurrent as a proof of photovolatic behavior and provide insight as to how the observed surface polycrystallinity and the resulting interface affect these device-level properties. Additionally, a photovoltage is induced in both types of conical InN nanowires on silicon, which is not replicated in epitaxial InN thin films. PMID:27455379

  13. Growth mechanism and microstructure of low defect density InN (0001) In-face thin films on Si (111) substrates

    SciTech Connect

    Kehagias, Th.; Dimitrakopulos, G. P.; Koukoula, T.; Komninou, Ph.; Ajagunna, A. O.; Georgakilas, A.; Tsagaraki, K.; Adikimenakis, A.

    2013-10-28

    Transmission electron microscopy has been employed to analyze the direct nucleation and growth, by plasma-assisted molecular beam epitaxy, of high quality InN (0001) In-face thin films on (111) Si substrates. Critical steps of the heteroepitaxial growth process are InN nucleation at low substrate temperature under excessively high N-flux conditions and subsequent growth of the main InN epilayer at the optimum conditions, namely, substrate temperature 400–450 °C and In/N flux ratio close to 1. InN nucleation occurs in the form of a very high density of three dimensional (3D) islands, which coalesce very fast into a low surface roughness InN film. The reduced reactivity of Si at low temperature and its fast coverage by InN limit the amount of unintentional Si nitridation by the excessively high nitrogen flux and good bonding/adhesion of the InN film directly on the Si substrate is achieved. The subsequent overgrowth of the main InN epilayer, in a layer-by-layer growth mode that enhances the lateral growth of InN, reduces significantly the crystal mosaicity and the density of threading dislocations is about an order of magnitude less compared to InN films grown using an AlN/GaN intermediate nucleation/buffer layer on Si. The InN films exhibit the In-face polarity and very smooth atomically stepped surfaces.

  14. Two-dimensional electron gas in monolayer InN quantum wells

    SciTech Connect

    Pan, W. E-mail: e.dimakis@hzdr.de; Wang, G. T.; Dimakis, E. E-mail: e.dimakis@hzdr.de; Moustakas, T. D.; Tsui, D. C.

    2014-11-24

    We report in this letter experimental results that confirm the two-dimensional nature of the electron systems in a superlattice structure of 40 InN quantum wells consisting of one monolayer of InN embedded between 10 nm GaN barriers. The electron density and mobility of the two-dimensional electron system (2DES) in these InN quantum wells are 5 × 10{sup 15 }cm{sup −2} (or 1.25 × 10{sup 14 }cm{sup −2} per InN quantum well, assuming all the quantum wells are connected by diffused indium contacts) and 420 cm{sup 2}/Vs, respectively. Moreover, the diagonal resistance of the 2DES shows virtually no temperature dependence in a wide temperature range, indicating the topological nature of the 2DES.

  15. My working week: John Innes.

    PubMed

    Innes, John

    2016-07-23

    In the first of a new series of features for Vet Record Careers, John Innes describes a recent working week as referrals director for CVS and a RCVS specialist in small animal orthopaedics. PMID:27450857

  16. Accommodation mechanism of InN nanocolumns grown on Si(111) substrates by molecular beam epitaxy

    SciTech Connect

    Grandal, J.; Sanchez-Garcia, M. A.; Calleja, E.; Luna, E.; Trampert, A.

    2007-07-09

    High quality InN nanocolumns have been grown by molecular beam epitaxy on bare and AlN-buffered Si(111) substrates. The accommodation mechanism of the InN nanocolumns to the substrate was studied by transmission electron microscopy. Samples grown on AlN-buffered Si(111) show abrupt interfaces between the nanocolumns and the buffer layer, where an array of periodically spaced misfit dislocations develops. Samples grown on bare Si(111) exhibit a thin Si{sub x}N{sub y} at the InN nanocolumn/substrate interface because of Si nitridation. The Si{sub x}N{sub y} thickness and roughness may affect the nanocolumn relative alignment to the substrate. In all cases, InN nanocolumns grow strain- and defect-free.

  17. Growth of InN nanorods prepared by plasma-assisted molecular beam epitaxy with varying Cr thicknesses

    NASA Astrophysics Data System (ADS)

    Liu, K. W.; Young, S. J.; Chang, S. J.; Hsueh, T. H.; Chen, Y. Z.; Chen, K. J.; Hung, H.; Wang, S. M.; Wu, Y. L.

    2012-05-01

    This study investigates how the thickness of Cr deposited on the Si substrate after the nitridation process influences the AIN buffer layer and the InN nanorods. Atomic force microscopy results reveal that different thicknesses of Cr form varying sizes of CrN nanoislands. The results of scanning electron microscopy and X-ray diffraction show that a Cr deposition thickness of 10 nm results in CrN nanoislands after the nitridation process, improving the quality and density of InN nanorods. A Cr layer that was too thick led to polycrystalline InN growth. The results of transmission electron microscopy indicate a baseball bat-like InN nanorod growth mechanism.

  18. III-Nitride nanowire optoelectronics

    NASA Astrophysics Data System (ADS)

    Zhao, Songrui; Nguyen, Hieu P. T.; Kibria, Md. G.; Mi, Zetian

    2015-11-01

    Group-III nitride nanowire structures, including GaN, InN, AlN and their alloys, have been intensively studied in the past decade. Unique to this material system is that its energy bandgap can be tuned from the deep ultraviolet (~6.2 eV for AlN) to the near infrared (~0.65 eV for InN). In this article, we provide an overview on the recent progress made in III-nitride nanowire optoelectronic devices, including light emitting diodes, lasers, photodetectors, single photon sources, intraband devices, solar cells, and artificial photosynthesis. The present challenges and future prospects of III-nitride nanowire optoelectronic devices are also discussed.

  19. Obstacles to the universal application of INNs.

    PubMed

    2014-10-01

    Anomalies in the international non-proprietary name (INN) nomenclature show that the international harmonisation of nonproprietary drug names has not been achieved. When pharmaceutical companies request a new INN, they try to obtain an INN that serves their interests, and then use it for promotional or anticompetitive purposes. Drug regulatory agencies are not fulfilling their duty to protect existing INNs, particularly with regard to biosimilars (copies of biotechnology-derived drugs), giving rise in particular to anomalous names. The independence of the World Health Organization INN programme must be safeguarded to ensure that the universal terminology it is responsible for developing is applied worldwide. PMID:25964979

  20. Electronic and optical properties of InN nanowires from first principles

    NASA Astrophysics Data System (ADS)

    Bayerl, Dylan; Kioupakis, Emmanouil

    2013-03-01

    Group-III-nitride nanowires are promising materials for photovoltaic and solid-state-lighting applications. We use first-principles calculations to investigate the electronic and optical properties of InN nanowires. Density functional theory provides the ground-state properties to which we subsequently apply quasiparticle corrections with the GW method. We thereby accurately predict the electronic band gaps, effective masses, and band dispersions of these nanostructured materials. We further solve the Bethe-Salpeter equation to predict the optical absorption spectra of InN nanowires as a function of cross-sectional dimension and geometry. We demonstrate that quantum confinement can increase the fundamental gap in InN nanowires as high as near-ultraviolet energies. This research was supported as part of CSTEC, an Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science. Computational resources were provided by the DOE NERSC facility.

  1. How INNs are created. Making drug names safer by contributing to INN selection.

    PubMed

    2015-06-01

    The international nonproprietary names (INNs) of drugs proposed by the World Health Organization (WHO) are released for public consultation. These consultations provide an opportunity to identify any risks associated with INNs that could lead to confusion. Prescrire has submitted numerous comments since it began participating in the WHO's public consultations on proposed INNs in 2007. The WHO INN programme has occasionally taken our objections into account. It is easier to replace a proposed INN when a risk of confusion is identified early, before the drug is introduced to the market and the INN enters into use. Regular analysis of the INNs proposed by the WHO reveals some of the challenges of naming drugs and the influence exerted by pharmaceutical companies and the US drug nomenclature committee (USANC) in particular. The lack of an identifiable common stem in certain INNs, sometimes perceived as an obstacle to INN comprehensibility, is a consequence of the procedure for assigning INNs, because the INN programme wants to ensure that new common stems are not created prematurely. Critical analysis of proposed INNs during WHO public consultations offers an insight into the challenges involved in devising common stems. This analysis is useful for improving the quality and safety of INNs. PMID:26436175

  2. Growth modes of InN (000-1) on GaN buffer layers on sapphire

    SciTech Connect

    Liu Bing; Kitajima, Takeshi; Chen Dongxue; Leone, Stephen R.

    2005-03-01

    In this work, using atomic force microscopy and scanning tunneling microscopy, we study the surface morphologies of epitaxial InN films grown by plasma-assisted molecular beam epitaxy with intervening GaN buffer layers on sapphire substrates. On smooth GaN buffer layers, nucleation and evolution of three-dimensional InN islands at various coverages and growth temperatures are investigated. The shapes of the InN islands are observed to be predominantly mesalike with large flat (000-1) tops, which suggests a possible role of indium as a surfactant. Rough GaN buffer layers composed of dense small GaN islands are found to significantly improve uniform InN wetting of the substrates, on which atomically smooth InN films are obtained that show the characteristics of step-flow growth. Scanning tunneling microscopy imaging reveals the defect-mediated surface morphology of smooth InN films, including surface terminations of screw dislocations and a high density of shallow surface pits with depths less than 0.3 nm. The mechanisms of the three-dimensional island size and shape evolution and formation of defects on smooth surfaces are considered.

  3. Growth modes of InN(000-1) on GaN buffer layers on sapphire

    SciTech Connect

    Liu, Bing; Kitajima, Takeshi; Chen, Dongxue; Leone, Stephen R.

    2005-01-24

    In this work, using atomic force microscopy and scanning tunneling microscopy, we study the surface morphologies of epitaxial InN films grown by plasma-assisted molecular beam epitaxy with intervening GaN buffer layers on sapphire substrates. On smooth GaN buffer layers, nucleation and evolution of three-dimensional InN islands at various coverages and growth temperatures are investigated. The shapes of the InN islands are observed to be predominantly mesa-like with large flat (000-1) tops, which suggests a possible role of indium as a surfactant. Rough GaN buffer layers composed of dense small GaN islands are found to significantly improve uniform InN wetting of the substrates, on which atomically smooth InN films are obtained that show the characteristics of step-flow growth. Scanning tunneling microscopy imaging reveals the defect-mediated surface morphology of smooth InN films, including surface terminations of screw dislocations and a high density of shallow surface pits with depths less than 0.3 nm. The mechanisms of the three-dimensional island size and shape evolution and formation of defects on smooth surfaces are considered.

  4. Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)

    NASA Astrophysics Data System (ADS)

    Haider, Ali; Kizir, Seda; Biyikli, Necmi

    2016-04-01

    In this work, we report on self-limiting growth of InN thin films at substrate temperatures as low as 200 °C by hollow-cathode plasma-assisted atomic layer deposition (HCPA-ALD). The precursors used in growth experiments were trimethylindium (TMI) and N2 plasma. Process parameters including TMI pulse time, N2 plasma exposure time, purge time, and deposition temperature have been optimized for self-limiting growth of InN with in ALD window. With the increase in exposure time of N2 plasma from 40 s to 100 s at 200 °C, growth rate showed a significant decrease from 1.60 to 0.64 Å/cycle. At 200 °C, growth rate saturated as 0.64 Å/cycle for TMI dose starting from 0.07 s. Structural, optical, and morphological characterization of InN were carried out in detail. X-ray diffraction measurements revealed the hexagonal wurtzite crystalline structure of the grown InN films. Refractive index of the InN film deposited at 200 °C was found to be 2.66 at 650 nm. 48 nm-thick InN films exhibited relatively smooth surfaces with Rms surface roughness values of 0.98 nm, while the film density was extracted as 6.30 g/cm3. X-ray photoelectron spectroscopy (XPS) measurements depicted the peaks of indium, nitrogen, carbon, and oxygen on the film surface and quantitative information revealed that films are nearly stoichiometric with rather low impurity content. In3d and N1s high-resolution scans confirmed the presence of InN with peaks located at 443.5 and 396.8 eV, respectively. Transmission electron microscopy (TEM) and selected area electron diffraction (SAED) further confirmed the polycrystalline structure of InN thin films and elemental mapping revealed uniform distribution of indium and nitrogen along the scanned area of the InN film. Spectral absorption measurements exhibited an optical band edge around 1.9 eV. Our findings demonstrate that HCPA-ALD might be a promising technique to grow crystalline wurtzite InN thin films at low substrate temperatures.

  5. Colloids in the River Inn

    NASA Astrophysics Data System (ADS)

    Ueckert, Martina; Niessner, Reinhard; Baumann, Thomas

    2015-04-01

    In the light of an increasing number of technical applications using nanoparticles and reports of adverse effects of engineered nanoparticles, research on the occurrence and stability of particles in all compartments has to be intensified. Colloids in river water represent the geologic setting, environmental conditions, and the anthropogenic use in its catchment. The river not only acts as a sink for nanoparticles but also as the source term due to exchange in the hyporheic zone and in bank filtration setups. The concentration, size distribution and elemental composition of particles in the River Inn were studied from the source in the Swiss Alps to the river mouth at Passau from 2008 to 2014. Samples were collected after each tributary from a sub-catchment and filtered on site using a new filtration device for gentle filtration. The elemental composition was determined after acid digestion with ICP/MS. SEM/EDX analysis provided morphological and elemental information for single particles. A complementary chemical analysis of the river water was performed to assess the geochemical stability of individual particles. As presented at EGU 2014, particles in the upper, rural parts mainly reveal changes in the geological setting of the tributary catchments. Not unexpectedly, particles originating from crystalline rocks, were more stable than particles originating from calcareous rocks. Anthropogenic and industrial influences increase in the lower parts. This went together with a change of the size distribution, an increase of the number of organic particles, and a decrease of the microfauna. Interestingly, specific leisure activities in a sub-catchment, like extensive downhill skiing, manifest itself in the particle composition. This general setting was validated in last year's sampling campaigns. An interesting change in on site parameters and hydrochemical composition was seen during all sampling campaigns at an inflow from the valley Kaunertal, Austria. Therefore

  6. Effect of interfacial lattice mismatch on bulk carrier concentration and band gap of InN

    SciTech Connect

    Kuyyalil, Jithesh; Tangi, Malleswararao; Shivaprasad, S. M.

    2012-10-15

    The issue of ambiguous values of the band gap (0.6 to 2 eV) of InN thin film in literature has been addressed by a careful experiment. We have grown wurtzite InN films by PA-MBE simultaneously on differently modified c-plane sapphire substrates and characterized by complementary structural and chemical probes. Our studies discount Mie resonances caused by metallic In segregation at grain boundaries as the reason for low band gap values ( Almost-Equal-To 0.6 eV) and also the formation of Indium oxides and oxynitrides as the cause for high band gap value ( Almost-Equal-To 2.0 eV). It is observed that polycrystallinity arising from azimuthal miss-orientation of c-oriented wurtzite InN crystals increases the carrier concentration and the band gap values. We have reviewed the band gap, carrier concentration, and effective mass of InN in literature and our own measurements, which show that the Moss-Burstein relation with a non-parabolic conduction band accounts for the observed variation of band gap with carrier concentration.

  7. An investigation into the conversion of In2O3 into InN nanowires

    PubMed Central

    2011-01-01

    Straight In2O3 nanowires (NWs) with diameters of 50 nm and lengths ≥2 μm have been grown on Si(001) via the wet oxidation of In at 850°C using Au as a catalyst. These exhibited clear peaks in the X-ray diffraction corresponding to the body centred cubic crystal structure of In2O3 while the photoluminescence (PL) spectrum at 300 K consisted of two broad peaks, centred around 400 and 550 nm. The post-growth nitridation of In2O3 NWs was systematically investigated by varying the nitridation temperature between 500 and 900°C, flow of NH3 and nitridation times between 1 and 6 h. The NWs are eliminated above 600°C while long nitridation times at 500 and 600°C did not result into the efficient conversion of In2O3 to InN. We find that the nitridation of In2O3 is effective by using NH3 and H2 or a two-step temperature nitridation process using just NH3 and slower ramp rates. We discuss the nitridation mechanism and its effect on the PL. PMID:21711836

  8. Mass transport and alloying during InN growth on GaN by molecular-beam epitaxy

    SciTech Connect

    Liu, Y.; Xie, M.H.; Wu, H.S.; Tong, S.Y.

    2006-05-29

    During Stranski-Krastanov (SK) growth of InN on GaN by molecular-beam epitaxy, a mass transport is noted from the two-dimensional wetting layer and/or the surface excess metal adlayers to the SK islands when the excess nitrogen flux is used for deposition. The extent of mass transport depends on the material coverage. For growth under the excess indium flux condition, no such mass transport is observed.

  9. Defect Doping of InN

    SciTech Connect

    Jones, R.E.; van Genuchten, H.C.M.; Yu, K.M.; Walukiewicz, W.; Li, S.X.; A ger III, J.W.; Liliental-Weber, Z.; Haller, E.E.; Lu, H.; Schaff, W.J.

    2007-07-22

    InN films grown by molecular beam epitaxy have been subjected to 2 MeV He{sup +} irradiation followed by thermal annealing. Theoretical analysis of the electron mobilities shows that thermal annealing removes triply charged donor defects, creating films with electron mobilities approaching those predicted for uncompensated, singly charged donors. Optimum thermal annealing of irradiated InN can be used to produce samples with electron mobilities higher than those of as grown films.

  10. Colloids in the River Inn

    NASA Astrophysics Data System (ADS)

    Ueckert, Martina; Baumann, Thomas

    2014-05-01

    In the light of an increasing number of technical applications using nanoparticles and reports of adverse effects of engineered nanoparticles, research on the occurrence and stability of particles in all compartments has to be intensified. Colloids in river water represent the geologic setting, environmental conditions, and the anthropogenic use in its catchment. The river not only acts as a sink for nanoparticles but also as the source term due to exchange in the hyporheic zone and in bank filtration setups. The concentration, size distribution and elemental composition of particles in the River Inn were studied from the source in the Swiss Alps to the river mouth at Passau. Samples were collected after each tributary from a sub-catchment and filtered on-site. The elemental composition was determined after acid digestion with ICP/MS. SEM/EDX analyses provided morphological and elemental information for single particles. A complementary chemical analysis of the river water was performed to assess the geochemical stability of indvidual particles. Particles in the upper, rural parts mainly reveal changes in the geological setting of the tributary catchments. Not unexpectedly, particles originating from crystalline rocks, were more stable than particles originating from calcareous rocks. Anthropogenic and industrial influences increase in the lower parts. This went together with a change of the size distribution, an increase of the number of organic particles, and a decrease of the microfauna. Interestingly, specific leisure activities in a sub-catchment, like extensive downhill skiing, manifest itself in the particle composition.

  11. Molten salt-based growth of bulk GaN and InN for substrates.

    SciTech Connect

    Waldrip, Karen Elizabeth

    2007-08-01

    An atmospheric pressure approach to growth of bulk group III-nitrides is outlined. Native III-nitride substrates for optoelectronic and high power, high frequency electronics are desirable to enhance performance and reliability of these devices; currently, these materials are available in research quantities only for GaN, and are unavailable in the case of InN. The thermodynamics and kinetics of the reactions associated with traditional crystal growth techniques place these activities on the extreme edges of experimental physics. The novel techniques described herein rely on the production of the nitride precursor (N{sup 3-}) by chemical and/or electrochemical methods in a molten halide salt. This nitride ion is then reacted with group III metals in such a manner as to form the bulk nitride material. The work performed during the period of funding (February 2006-September 2006) focused on establishing that mass transport of GaN occurs in molten LiCl, the construction of a larger diameter electrochemical cell, the design, modification, and installation of a made-to-order glove box (required for handling very hygroscopic LiCl), and the feasibility of using room temperature molten salts to perform nitride chemistry experiments.

  12. The Children's Inn at NIH turns 25 | NIH MedlinePlus the Magazine

    MedlinePlus

    ... of this page please turn JavaScript on. Feature: The Children's Inn The Children's Inn at NIH turns 25 Past Issues / ... home …" for all families! What to Expect at The Children's Inn The Children's Inn enhances opportunities for ...

  13. Novel compound semiconductor devices based on III-V nitrides

    SciTech Connect

    Pearton, S.J.; Abernathy, C.R.; Ren, F.

    1995-10-01

    New developments in dry and wet etching, ohmic contacts and epitaxial growth of Ill-V nitrides are reported. These make possible devices such as microdisk laser structures and GaAs/AlGaAs heterojunction bipolar transistors with improved InN ohmic contacts.

  14. Molten salt-based growth of bulk GaN and InN for substrates.

    SciTech Connect

    Waldrip, Karen Elizabeth; Tsao, Jeffrey Yeenien; Kerley, Thomas M.

    2006-09-01

    An atmospheric pressure approach to growth of bulk group III-nitrides is outlined. Native III-nitride substrates for optoelectronic and high power, high frequency electronics are desirable to enhance performance and reliability of these devices; currently, these materials are available in research quantities only for GaN, and are unavailable in the case of InN. The thermodynamics and kinetics of the reactions associated with traditional crystal growth techniques place these activities on the extreme edges of experimental physics. The technique described herein relies on the production of the nitride precursor (N3-) by chemical and/or electrochemical methods in a molten halide salt. This nitride ion is then reacted with group III metals in such a manner as to form the bulk nitride material. The work performed during the period of funding (July 2004-September 2005) focused on the initial measurement of the solubility of GaN in molten LiCl as a function of temperature, the construction of electrochemical cells, the modification of a commercial glove box (required for handling very hygroscopic LiCl), and on securing intellectual property for the technique.

  15. 16. LOOKING WEST AT OLD FAITHFUL INN, MOST OF THE ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    16. LOOKING WEST AT OLD FAITHFUL INN, MOST OF THE EAST WING IS VISIBLE TO THE LEFT. THE EAST WING ADDITION WAS BUILT BY THE INN'S ORIGINAL ARCHITECT, ROBERT C. REAMER IN 1913-14. - Old Faithful Inn, 900' northeast of Snowlodge & 1050' west of Old Faithful Lodge, Lake, Teton County, WY

  16. Taming transport in InN

    SciTech Connect

    Ager III, Joel W.; Miller, Nate R.

    2011-05-29

    The large electron affinity of InN, close to 6 eV and the largest of any III-V semiconductor, creates a strong driving force for native donor formation, both in the bulk and at surfaces and interfaces. Moreover, all InN surfaces, regardless of crystal orientation or doping, have been observed to have a surface accumulation layer of electrons, which interferes with standard electrical measurements. For these reasons, until recently, it was uncertain whether or not compensation by donor defects would prevent “real” p-type activity (i.e. existence of sufficiently shallow acceptors and mobile holes). A coordinated experimental approach using a combination of electrical (Hall effect) and electrothermal (Seebeck coefficient) measurements will be described that allows definitive evaluation of carrier transport in InN. In Mg-doped InN films, the sensitivity of thermopower to bulk hole conduction, combined with modeling of the parallel conducting layers (surface/bulk/interface), enables quantitative measurement of the free hole concentration and mobility. In undoped (n-type) material, combined Hall and thermopower measurements, along with a considering of the scattering mechanisms, leads to a quantitative understanding of the crucial role of charged line defects in limiting electron transport.

  17. X-ray diffraction study of A- plane non-polar InN epilayer grown by MOCVD

    NASA Astrophysics Data System (ADS)

    Moret, Matthieu; Briot, Olivier; Gil, Bernard

    2015-03-01

    Strong polarisation-induced electric fields in C-plane oriented nitrides semiconductor layers reduce the performance of devices. Eliminating the polarization fields can be achieved by growing nitrides along non polar direction. We have grown non polar A-plane oriented InN on R-plane (1‾102) nitridated sapphire substrate by MOCVD. We have studied the structural anisotropy observed in these layers by analyzing High Resolution XRay Diffraction rocking curve (RC) experiments as a function of the in-plane beam orientation. A-plane InN epilayer have a unique epitaxial relationship on R-Plane sapphire and show a strong structural anisotropy. Full width at half maximum (FWHM) of the InN(11‾20) XRD RC values are contained between 44 and 81 Arcmin. FWHM is smaller when the diffraction occurs along the [0001] and the largest FWHM values, of the (11‾20) RC, are obtained when the diffraction occurs along the [1‾100] in-plane direction. Atomic Force Microscopy imaging revealed morphologies with well organized crystallites. The grains are structured along a unique crystallographic orientation of InN, leading to larger domains in this direction. This structural anisotropy can be, in first approximation, attributed to the difference in the domain sizes observed. XRD reciprocal space mappings (RSM) were performed in asymmetrical configuration on (13‾40) and (2‾202) diffraction plane. RSM are measured with a beam orientation corresponding to a maximal and a minimal width of the (11‾20) Rocking curves, respectively. A simple theoretical model is exposed to interpret the RSM. We concluded that the dominant contribution to the anisotropy is due to the scattering coherence length anisotropy present in our samples.

  18. Inhomogeneities in MOVPE InN

    NASA Astrophysics Data System (ADS)

    Yamamoto, Akio; Miwa, Hiroshi; Wang, Wen Jun; Hashimoto, Akihiro

    2006-01-01

    This paper reports the in-depth and in-plane inhomogeneities in InN films. Samples of InN are grown on sapphire substrates without or with a buffer using the atmospheric-pressure MOVPE. For the in-depth inhomogeneity analysis, the conventional PL measurement using an excitation source with a different wavelength is made from both the front surface and the film/substrate interface sides of samples. The measurement reveals that samples grown for a long time without buffer contain a deteriorated layer, which shows a higher PL peak energy, near the film/substrate interface. Such a layer is never found on the surface side. The deterioration is markedly enhanced when the sample is annealed in an NH3 flow. Since the coexistence of TMI and NH3 (growth environment) suppresses the deterioration and the InN samples used in this experiment have an In-polarity, such a deterioration is hydrogen-related degradation on the N-face of InN film. In-plane inhomogeneity of InN grown with a different buffer is studied by analyzing PL and absorption data. A wider PL spectrum and a larger discrepancy between PL peak energy and absorption edge, those are observed for films grown without buffer, are well explained by taking account of a large in-plane inhomogeneity in the samples. The existence of the large in-plane inhomogeneity is confirmed by the near-field PL mapping obtained by the SNOM. The SNOM analysis also shows that, although the use of the buffer improves the apparent in-plane uniformity, such a film has a fine inhomogeneity due to small grains of the buffer.

  19. First-principles calculations for AlN, GaN, and InN: Bulk and alloy properties

    SciTech Connect

    Wright, A.F.; Nelson, J.S.

    1995-02-01

    First-principles density-functional calculations utilizing ab initio pseudopotentials and plane-wave expansions are used to determine lattice parameters, bulk moduli, and band structures for AlN, GaN and InN. It is found that large numbers of plane waves are necessary to resolve the nitrogen 2p wave functions and that explicit treatment of the gallium 3d and indium 4d electrons is important for an accurate description of GaN and InN. Several properties of ternary zinc-blende alloys are determined including their bond-length and bond-angle relaxation and their energy-gap bowing parameters. The similarity of the calculated zinc-blende and wurtzite direct gaps also allows estimates to be made of the energy gap versus composition for wurtzite alloys.

  20. Mg doped InN and confirmation of free holes in InN

    SciTech Connect

    Wang, K.; Yamaguchi, T.; Miller, N.; Mayer, M. A.; Haller, E. E.; Iwamoto, R.; Araki, T.; Nanishi, Y.; Yu, K. M.; Walukiewicz, W.; Ager, J. W. III

    2011-01-24

    We report a systematic investigation on Mg doped InN epilayers grown by radio-frequency plasma-assisted molecular beam epitaxy. Electrolyte capacitance voltage (ECV) combined with thermopower measurements find p-type conduction over an Mg concentration range. For InN:Mg in this p-type 'window' the Seebeck coefficients dramatically change their signs from negative to positive when the thickness of undoped InN interlayer decreases to zero. This notable sign change of Seebeck coefficient explains the previous inconsistency between ECV and thermopower results and confirms the existence of mobile holes in the InN:Mg. Taking into account the undoped InN interlayer, the hole density and mobility are extracted.

  1. Post-growth thermal oxidation of wurtzite InN thin films into body-center cubic In{sub 2}O{sub 3} for chemical/gas sensing applications

    SciTech Connect

    Liu, H.F.; Yakovlev, N.L.; Chi, D.Z.; Liu, W.

    2014-06-01

    Post-growth thermal oxidations of InN have been studied using high-resolution x-ray diffraction (HRXRD) and secondary ion-mass spectroscopy (SIMS). The InN thin films, having relative high crystal quality, were grown by metal–organic chemical vapor deposition (MOCVD) on c-sapphire substrates using InGaN/GaN buffer layers. HRXRD reveals that oxidation of wurtzite InN into body-center cubic In{sub 2}O{sub 3} occurred at elevated temperatures. A Si{sub 3}N{sub 4} encapsulation improves the crystal quality of In{sub 2}O{sub 3} oxidized by using conventional rapid thermal annealing (RTA) but it results in the presence of undesired metallic indium. Cycle-RTA not only improves the crystal quality but also avoids the byproduct of metallic indium. SIMS depth profile, using contaminate elements as the ‘interface markers,’ provide evidence that the oxidation of InN is dominated by oxygen inward diffusion mechanism. Together with the HRXRD results, we conclude that the crystal quality of the resultant In{sub 2}O{sub 3}/InN heterostructure is mainly controlled by the balance between the speeds of oxygen diffusion and InN thermal dissociation, which can be effectively tuned by cycle-RTA. The obtained In{sub 2}O{sub 3}/InN heterostructures can be fundamental materials for studying high speed chemical/gas sensing devices. - Graphical abstract: Oxidation of h-InN into bcc-In{sub 2}O{sub 3} has been realized at elevated temperatures. A Si{sub 3}N{sub 4} cap improves the crystal quality of In{sub 2}O{sub 3} oxidized by conventional RTA but it results in the presence of undesired metallic indium. Cycle-RTA not only improves the crystal quality but also avoids the byproduct of metallic indium. SIMS depth profiles provide evidence that the oxidation of InN is dominated by oxygen inward diffusion mechanism. The crystal quality of the resultant In{sub 2}O{sub 3}/InN heterostructure is mainly controlled by the balance between the speeds of oxygen diffusion and InN thermal

  2. Investigation of gas sensing properties of InN nanoparticles

    SciTech Connect

    Madapu, Kishore K. E-mail: dhara@igcar.gov.in; Prasad, A. K.; Tyagi, A. K.; Dhara, S. E-mail: dhara@igcar.gov.in

    2015-06-24

    InN nanoparticles were grown by chemical vapor deposition technique using In{sub 2}O{sub 3} as precursor material. Raman spectroscopic studies show the presence of the wurtzite phase of as-grown InN. Size of the nanoparticles were in range from quantum dot (<8 nm) to larger sized particles (100 nm). We studied the gas sensing properties of InN nanoparticles with CH{sub 4} gas. Sensors substrates were fabricated with interdigitated Au electrodes. InN nanoparticles show high response towards CH{sub 4} with minimum detectable concentration of 50 ppm at 200 °C.

  3. Investigation of gas sensing properties of InN nanoparticles

    NASA Astrophysics Data System (ADS)

    Madapu, Kishore K.; Prasad, A. K.; Tyagi, A. K.; Dhara, S.

    2015-06-01

    InN nanoparticles were grown by chemical vapor deposition technique using In2O3 as precursor material. Raman spectroscopic studies show the presence of the wurtzite phase of as-grown InN. Size of the nanoparticles were in range from quantum dot (<8 nm) to larger sized particles (100 nm). We studied the gas sensing properties of InN nanoparticles with CH4 gas. Sensors substrates were fabricated with interdigitated Au electrodes. InN nanoparticles show high response towards CH4 with minimum detectable concentration of 50 ppm at 200 °C.

  4. The Children's Inn at NIH Anniversary Key Messages | NIH MedlinePlus the Magazine

    MedlinePlus

    ... of this page please turn JavaScript on. Feature: The Children's Inn The Children's Inn at NIH Past Issues / Summer 2014 ... Contents Anniversary Key Messages Playground and Park at The Children's Inn at NIH. Photo courtesy of Mahan ...

  5. Growth kinetics and island evolution during double-pulsed molecular beam epitaxy of InN

    NASA Astrophysics Data System (ADS)

    Kraus, A.; Hein, C.; Bremers, H.; Rossow, U.; Hangleiter, A.

    2016-06-01

    The kinetic processes of InN growth using alternating source fluxes with sub-monolayer In pulses in plasma-assisted molecular beam epitaxy have been investigated. Growth at various temperatures reveals the existence of two growth regimes. While growth at low temperatures is solely governed by surface diffusion, a combination of decomposition, desorption, and diffusion becomes decisive at growth temperatures of 470 °C and above. At this critical temperature, the surface morphology changes from a grainy structure to a structure made of huge islands. The formation of those islands is attributed to the development of an indium adlayer, which can be observed via reflection high energy electron diffraction monitoring. Based on the growth experiments conducted at temperatures below TGrowth = 470 °C, an activation energy for diffusion of 0.54 ± 0.02 eV has been determined from the decreasing InN island density. A comparison between growth on metalorganic vapor phase epitaxy GaN templates and pseudo bulk GaN indicates that step edges and dislocations are favorable nucleation sites. Based on the results, we developed a growth model, which describes the main mechanisms of the growth.

  6. Metals fact sheet - indium

    SciTech Connect

    1994-01-01

    Indium is generally found in concentrations averaging 10 to 20 ppm in sphalerite and chalcopyrite ores associated with zinc, copper, lead and tin deposits. Indium is recovered as a by-product of base metal mining by open pit, underground and other methods. After the recovery of zinc by the electrolytic process (copper concentrate by flotation, and lead and tin by electrolysis), indium antimonide slimes left on the anode and the indium-containing spent electrolyte become the input material for the processing of indium. Sulfuric acid is combined with the residues and heated to form sulfates which are then leached with water to filter off the remaining tin, lead and antimony. The indium in solution is recovered by cementation on aluminum, washed, melted, and refined into a metal.

  7. 21. REAR OF OLD FAITHFUL INN, LOOKING NORTH. SEMICIRCULAR SIDE ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    21. REAR OF OLD FAITHFUL INN, LOOKING NORTH. SEMI-CIRCULAR SIDE DINING ROOM, NOW CALLED THE BEAR PIT WAS ADDED IN 1927. (TAKEN FROM CHERRY-PICKER) - Old Faithful Inn, 900' northeast of Snowlodge & 1050' west of Old Faithful Lodge, Lake, Teton County, WY

  8. Solar Hot Water for Motor Inn--Texas City, Texas

    NASA Technical Reports Server (NTRS)

    1982-01-01

    Final report describes solar domestic-hot-water heater installation at LaQuinta Motor Inn, Texas City, Texas which furnished 63% of total hot-water load of new 98-unit inn. Report presents a description of system, drawings and photographs of collectors, operations and maintenance instructions, manufacturers' specifications for pumps, and an engineer's report on performance.

  9. Wet Chemical Etching Survey of III-Nitrides

    SciTech Connect

    Abernathy, C.R.; Cho, H.; Hays, D.C.; MacKenzie, J.D.; Pearton, S.J.; Ren, F.; Shul, R.J.; Vartuli, C.B.; Zolper, J.C.

    1999-02-04

    Wet chemical etching of GaN, InN, AlN, InAlN and InGaN was investigated in various acid and base solutions at temperatures up to 75 C. Only KOH-based solutions were found to etch AlN and InAlN. No etchants were found for the other nitrides, emphasizing their extreme lack of chemical reactivity. The native oxide on most of the nitrides could be removed in potassium tetraborate at 75 C, or HCl/H{sub 2}O at 25 C.

  10. Surface and bulk electronic properties of low temperature synthesized InN microcrystals

    NASA Astrophysics Data System (ADS)

    Barick, B. K.; Dhar, S.

    2015-04-01

    Structural and electronic properties of InN microcrystals, which are synthesized by nitridation of LiInO2 with NaNH2 in a Teflon-lined autoclave at temperatures ranging between 170 and 240 °C, are studied as a function of the growth temperature using x-ray diffraction (XRD), high resolution transmission electron microscopy (HRTEM), photo-absorption, Raman spectroscopy and x-ray photo-emission spectroscopy (XPS) techniques. Our study shows the formation of wurtzite InN crystals with an average size of 100 nm even at 170 °C. The study, furthermore, suggests an enhancement of electron concentration and a reduction of electron mobility in the crystal as the synthesis temperature (TS) decreases. The density of certain defects lying very close to the band edge is also found to increase with the reduction of TS. These defects are expected to act as donors, which can explain the enhancement of carrier concentration as the growth temperature decreases.

  11. Angular-dependent Raman study of a- and s-plane InN

    SciTech Connect

    Filintoglou, K.; Katsikini, M. Arvanitidis, J.; Lotsari, A.; Dimitrakopulos, G. P.; Vouroutzis, N.; Ves, S.; Christofilos, D.; Kourouklis, G. A.; Ajagunna, A. O.; Georgakilas, A.; Zoumakis, N.

    2015-02-21

    Angular-dependent polarized Raman spectroscopy was utilized to study nonpolar a-plane (11{sup ¯}20) and semipolar s-plane (101{sup ¯}1) InN epilayers. The intensity dependence of the Raman peaks assigned to the vibrational modes A{sub 1}(TO), E{sub 1}(TO), and E{sub 2}{sup h} on the angle ψ that corresponds to rotation around the growth axis, is very well reproduced by using expressions taking into account the corresponding Raman tensors and the experimental geometry, providing thus a reliable technique towards assessing the sample quality. The s- and a-plane InN epilayers grown on nitridated r-plane sapphire (Al{sub 2}O{sub 3}) exhibit good crystalline quality as deduced from the excellent fitting of the experimental angle-dependent peak intensities to the theoretical expressions as well as from the small width of the Raman peaks. On the contrary, in the case of the s-plane epilayer grown on non-nitridated r-plane sapphire, fitting of the angular dependence is much worse and can be modeled only by considering the presence of two structural modifications, rotated so as their c-axes are almost perpendicular to each other. Although the presence of the second variant is verified by transmission electron and atomic force microscopies, angular dependent Raman spectroscopy offers a non-destructive and quick way for its quantification. Rapid thermal annealing of this sample did not affect the angular dependence of the peak intensities. The shift of the E{sub 1}(TO) and E{sub 2}{sup h} Raman peaks was used for the estimation of the strain state of the samples.

  12. Vertically integrated (Ga, In)N nanostructures for future single photon emitters operating in the telecommunication wavelength range

    NASA Astrophysics Data System (ADS)

    Winden, A.; Mikulics, M.; Grützmacher, D.; Hardtdegen, H.

    2013-10-01

    Important technological steps are discussed and realized for future room-temperature operation of III-nitride single photon emitters. First, the growth technology of positioned single pyramidal InN nanostructures capped by Mg-doped GaN is presented. The optimization of their optical characteristics towards narrowband emission in the telecommunication wavelength range is demonstrated. In addition, a device concept and technology was developed so that the nanostructures became singularly addressable. It was found that the nanopyramids emit in the telecommunication wavelength range if their size is chosen appropriately. A p-GaN contacting layer was successfully produced as a cap to the InN pyramids and the top p-contact was achievable using an intrinsically conductive polymer PEDOT:PSS, allowing a 25% increase in light transmittance compared to standard Ni/Au contact technology. Single nanopyramids were successfully integrated into a high-frequency device layout. These decisive technology steps provide a promising route to electrically driven and room-temperature operating InN based single photon emitters in the telecommunication wavelength range.

  13. Local structure of indium oxynitride from x-ray absorption spectroscopy

    SciTech Connect

    T-Thienprasert, J.; Onkaw, D.; Rujirawat, S.; Limpijumnong, S.; Nukeaw, J.; Sungthong, A.; Porntheeraphat, S.; Singkarat, S.

    2008-08-04

    Synchrotron x-ray absorption near edge structures (XANES) measurements of In L{sub 3} edge is used in conjunction with first principles calculations to characterize rf magnetron sputtered indium oxynitride at different O contents. Good agreement between the measured and the independently calculated spectra are obtained. Calculations show that the XANES spectra of this alloy are sensitive to the coordination numbers of the In atoms, i.e., fourfold for indium nitride-like structures and sixfold for indium oxide-like structures, but not to the substitution of nearest neighbor N by O or vice versa.

  14. III-V nitrides and performance of graphene on copper plasmonic biosensor

    NASA Astrophysics Data System (ADS)

    Mohanty, Goutam; Sahoo, Bijaya Kumar

    2016-05-01

    In the present study, the influence of iii-v nitrides as well as Ge and Si on the sensitivity and performance of a graphene protected copper plasmonic biosensor has been investigated. These semiconductors have been used between copper (Cu) and graphene layers on a SF 10 glass prism. The sensitivity and performance of the biosensor has been computed for with and without semiconductors. III-V nitrides demonstrated high sensitivity and high figure of merit (FOM) in comparison to Si and Ge due to their superior electronic and optical properties. The enhancement of evanescent electric field due to Si, Ge, AlN, GaN and InN have been computed and found highest enhancement for InN. This happens due to high refractive index of InN than other semiconductors. Analysis shows that for a high sensitive imaging biosensor the required optimal thickness of copper, InN and graphene are respectively 32 nm, 13 nm and 0.34 nm for light of wavelength λ = 633 nm (red Hesbnd Ne laser). This study suggests that InN would be a better choice for fabrication of new imaging plasmonic biosensors for chemical and biological sensing.

  15. Indium fluoride glass fibers

    NASA Astrophysics Data System (ADS)

    Saad, Mohammed

    2012-03-01

    Fluoride glasses are the only material that transmit light from ultraviolet to mid-infrared and can be drawn into industrial optical fibers. The mechanical and optical properties of new indium fluoride glass fibers have been investigated. Multimode fiber 190 microns, has very high mechanical strength greater than 100 kpsi and optical loss as low as 45 dB/km between 2 and 4 microns. Unlike chalcogenide glass fibers, indium fluoride fiber has a wide transmission window from 0.3 to 5.5 microns without any absorption peak. Indium fluoride glass fibers are the technology of choice for all application requiring transmission up to 5 micron such as infrared contour measure (IRCM) and chemical sensing. Furthermore, Indium fluoride glasses have low phonon energy and can be heavily doped and co-doped whit rare-earth elements. Therefore they are very promising candidates for infrared fiber lasers.

  16. Ultralow wear of gallium nitride

    NASA Astrophysics Data System (ADS)

    Zeng, Guosong; Tan, Chee-Keong; Tansu, Nelson; Krick, Brandon A.

    2016-08-01

    Here, we reveal a remarkable (and surprising) physical property of GaN: it is extremely wear resistant. In fact, we measured the wear rate of GaN is approaching wear rates reported for diamond. Not only does GaN have an ultralow wear rate but also there are quite a few experimental factors that control the magnitude of its wear rate, further contributing to the rich and complex physics of wear of GaN. Here, we discovered several primary controlling factors that will affect the wear rate of III-Nitride materials: crystallographic orientation, sliding environment, and coating composition (GaN, InN and InGaN). Sliding in the ⟨ 1 2 ¯ 10 ⟩ is significantly lower wear than ⟨ 1 1 ¯ 00 ⟩ . Wear increases by 2 orders of magnitude with increasing humidity (from ˜0% to 50% RH). III-Nitride coatings are promising as multifunctional material systems for device design and sliding wear applications.

  17. Ambient temperature deposition of gallium nitride/gallium oxynitride from a deep eutectic electrolyte, under potential control.

    PubMed

    Sarkar, Sujoy; Sampath, S

    2016-05-11

    A ternary, ionically conducting, deep eutectic solvent based on acetamide, urea and gallium nitrate is reported for the electrodeposition of gallium nitride/gallium indium nitride under ambient conditions; blue and white light emitting photoluminescent deposits are obtained under potential control. PMID:27074315

  18. Self-annihilation of inversion domains by high energy defects in III-Nitrides

    SciTech Connect

    Koukoula, T.; Kioseoglou, J. Kehagias, Th.; Komninou, Ph.; Ajagunna, A. O.; Georgakilas, A.

    2014-04-07

    Low-defect density InN films were grown on Si(111) by molecular beam epitaxy over an ∼1 μm thick GaN/AlN buffer/nucleation layer. Electron microscopy observations revealed the presence of inverse polarity domains propagating across the GaN layer and terminating at the sharp GaN/InN (0001{sup ¯}) interface, whereas no inversion domains were detected in InN. The systematic annihilation of GaN inversion domains at the GaN/InN interface is explained in terms of indium incorporation on the Ga-terminated inversion domains forming a metal bonded In-Ga bilayer, a structural instability known as the basal inversion domain boundary, during the initial stages of InN growth on GaN.

  19. The INNs and outs of antibody nonproprietary names.

    PubMed

    Jones, Tim D; Carter, Paul J; Plückthun, Andreas; Vásquez, Max; Holgate, Robert G E; Hötzel, Isidro; Popplewell, Andrew G; Parren, Paul W H I; Enzelberger, Markus; Rademaker, Hendrik J; Clark, Michael R; Lowe, David C; Dahiyat, Bassil I; Smith, Victoria; Lambert, John M; Wu, Herren; Reilly, Mary; Haurum, John S; Dübel, Stefan; Huston, James S; Schirrmann, Thomas; Janssen, Richard A J; Steegmaier, Martin; Gross, Jane A; Bradbury, Andrew R M; Burton, Dennis R; Dimitrov, Dimiter S; Chester, Kerry A; Glennie, Martin J; Davies, Julian; Walker, Adam; Martin, Steve; McCafferty, John; Baker, Matthew P

    2016-01-01

    An important step in drug development is the assignment of an International Nonproprietary Name (INN) by the World Health Organization (WHO) that provides healthcare professionals with a unique and universally available designated name to identify each pharmaceutical substance. Monoclonal antibody INNs comprise a -mab suffix preceded by a substem indicating the antibody type, e.g., chimeric (-xi-), humanized (-zu-), or human (-u-). The WHO publishes INN definitions that specify how new monoclonal antibody therapeutics are categorized and adapts the definitions to new technologies. However, rapid progress in antibody technologies has blurred the boundaries between existing antibody categories and created a burgeoning array of new antibody formats. Thus, revising the INN system for antibodies is akin to aiming for a rapidly moving target. The WHO recently revised INN definitions for antibodies now to be based on amino acid sequence identity. These new definitions, however, are critically flawed as they are ambiguous and go against decades of scientific literature. A key concern is the imposition of an arbitrary threshold for identity against human germline antibody variable region sequences. This leads to inconsistent classification of somatically mutated human antibodies, humanized antibodies as well as antibodies derived from semi-synthetic/synthetic libraries and transgenic animals. Such sequence-based classification implies clear functional distinction between categories (e.g., immunogenicity). However, there is no scientific evidence to support this. Dialog between the WHO INN Expert Group and key stakeholders is needed to develop a new INN system for antibodies and to avoid confusion and miscommunication between researchers and clinicians prescribing antibodies. PMID:26716992

  20. The INNs and outs of antibody nonproprietary names

    PubMed Central

    Jones, Tim D.; Carter, Paul J.; Plückthun, Andreas; Vásquez, Max; Holgate, Robert G.E.; Hötzel, Isidro; Popplewell, Andrew G.; Parren, Paul W.H.I.; Enzelberger, Markus; Rademaker, Hendrik J.; Clark, Michael R.; Lowe, David C.; Dahiyat, Bassil I.; Smith, Victoria; Lambert, John M.; Wu, Herren; Reilly, Mary; Haurum, John S.; Dübel, Stefan; Huston, James S.; Schirrmann, Thomas; Janssen, Richard A.J.; Steegmaier, Martin; Gross, Jane A.; Bradbury, Andrew R.M.; Burton, Dennis R.; Dimitrov, Dimiter S.; Chester, Kerry A.; Glennie, Martin J.; Davies, Julian; Walker, Adam; Martin, Steve; McCafferty, John; Baker, Matthew P.

    2016-01-01

    An important step in drug development is the assignment of an International Nonproprietary Name (INN) by the World Health Organization (WHO) that provides healthcare professionals with a unique and universally available designated name to identify each pharmaceutical substance. Monoclonal antibody INNs comprise a –mab suffix preceded by a substem indicating the antibody type, e.g., chimeric (-xi-), humanized (-zu-), or human (-u-). The WHO publishes INN definitions that specify how new monoclonal antibody therapeutics are categorized and adapts the definitions to new technologies. However, rapid progress in antibody technologies has blurred the boundaries between existing antibody categories and created a burgeoning array of new antibody formats. Thus, revising the INN system for antibodies is akin to aiming for a rapidly moving target. The WHO recently revised INN definitions for antibodies now to be based on amino acid sequence identity. These new definitions, however, are critically flawed as they are ambiguous and go against decades of scientific literature. A key concern is the imposition of an arbitrary threshold for identity against human germline antibody variable region sequences. This leads to inconsistent classification of somatically mutated human antibodies, humanized antibodies as well as antibodies derived from semi-synthetic/synthetic libraries and transgenic animals. Such sequence-based classification implies clear functional distinction between categories (e.g., immunogenicity). However, there is no scientific evidence to support this. Dialog between the WHO INN Expert Group and key stakeholders is needed to develop a new INN system for antibodies and to avoid confusion and miscommunication between researchers and clinicians prescribing antibodies. PMID:26716992

  1. Growth of III-Nitrides by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Tang, Liang

    Nitride compound materials are highly desirable for optoelectronic and power device applications due to their unique combinations of material properties. However due to the large lattice mismatches between AlN and GaN(2.5%), and between InN and GaN(11%), growth of nitride devices which contains lattice mismatched multiple quantum well (MQW) structures remains a challenge. In this work the growth of III-Nitride by the MBE method is investigated, covering the growth of AlGaN/GaN Resonant tunneling Diode, the growth of In0.18 Al0.82N that is lattice matched to GaN, and the fabrication of free standing GaN nanomembranes

  2. Nanogenerators based on vertically aligned InN nanowires.

    PubMed

    Liu, Guocheng; Zhao, Songrui; Henderson, Robert D E; Leonenko, Zoya; Abdel-Rahman, Eihab; Mi, Zetian; Ban, Dayan

    2016-01-28

    Piezoelectric nanogenerators (NGs) based on vertically aligned InN nanowires (NWs) are fabricated, characterized, and evaluated. In these NGs, arrays of p-type and intrinsic InN NWs prepared by plasma-assisted molecular beam epitaxy (MBE) demonstrate similar piezoelectric properties. The p-type NGs show 160% more output current and 70% more output power product than the intrinsic NGs. The features driving performance enhancement are reduced electrostatic losses due to better NW array morphology, improved electromechanical energy conversion efficiency due to smaller NW diameters, and the higher impedance of intrinsic NGs due to elevated NW surface charge levels. These findings highlight the potential of InN based NGs as a power source for self-powered systems and the importance of NW morphology and surface state in overall NG performance. PMID:26700694

  3. The Children's Inn at NIH turns 25 | NIH MedlinePlus the Magazine

    MedlinePlus

    ... a supportive environment, including therapeutic, educational, and recreational programming. Dalvin plays board games at The Inn's Woodmont ... Clinical Center. The Inn has a playroom, kids' computer room, bistro, game room, learning center, business center, ...

  4. The Children's Inn at NIH Anniversary Key Messages | NIH MedlinePlus the Magazine

    MedlinePlus

    ... through mutual support including therapeutic, recreational, and educational programming. Establishment of The Inn took hard work, dedication ... 7 million for the expansion project. fast facts 1 The Children's Inn, located on the NIH campus ...

  5. The Children's Inn at NIH - Three Stories | NIH MedlinePlus the Magazine

    MedlinePlus

    ... of this page please turn JavaScript on. Feature: The Children's Inn The Children's Inn at NIH - Three Stories Past Issues / Summer 2014 Table of Contents Kristal Nemeroff—The Patient Kristal Nemeroff, age 2, at the Children's ...

  6. The Place Where Hope Lives: The Children's Inn Comforts Kids and Their Families

    MedlinePlus

    Skip Navigation Bar Home Current Issue Past Issues The Place Where Hope Lives: The Children's Inn Comforts Kids and Their Families Past ... Story by Melanie Modlin Photography by Veronika Lukasova The Children's Inn at NIH is a unique homeaway- ...

  7. Indium sealing techniques.

    NASA Technical Reports Server (NTRS)

    Hochuli, U.; Haldemann, P.

    1972-01-01

    Gold films are used as an alloying flux to form 5-micron-thick indium film seals at temperatures below 300 C. Pyrex was sealed to quartz, ULE, CER-VIT, Irtran 2, Ge, GaAs, Invar, Kovar, Al, and Cu. The seals can also be used as current feedthroughs and graded seals.

  8. Respirable Indium Exposures, Plasma Indium, and Respiratory Health Among Indium-Tin Oxide (ITO) Workers

    PubMed Central

    Cummings, Kristin J.; Virji, M. Abbas; Park, Ji Young; Stanton, Marcia L.; Edwards, Nicole T.; Trapnell, Bruce C.; Carey, Brenna; Stefaniak, Aleksandr B.; Kreiss, Kathleen

    2016-01-01

    Background Workers manufacturing indium-tin oxide (ITO) are at risk of elevated indium concentration in blood and indium lung disease, but relationships between respirable indium exposures and biomarkers of exposure and disease are unknown. Methods For 87 (93%) current ITO workers, we determined correlations between respirable and plasma indium and evaluated associations between exposures and health outcomes. Results Current respirable indium exposure ranged from 0.4 to 108 μg/m3 and cumulative respirable indium exposure from 0.4 to 923 μg-yr/m3. Plasma indium better correlated with cumulative (rs = 0.77) than current exposure (rs = 0.54) overall and with tenure ≥1.9 years. Higher cumulative respirable indium exposures were associated with more dyspnea, lower spirometric parameters, and higher serum biomarkers of lung disease (KL-6 and SP-D), with significant effects starting at 22 μg-yr/m3, reached by 46% of participants. Conclusions Plasma indium concentration reflected cumulative respirable indium exposure, which was associated with clinical, functional, and serum biomarkers of lung disease. PMID:27219296

  9. No Vacancy: Inn Provides Revenue Source for Financially Troubled Institute.

    ERIC Educational Resources Information Center

    Bridges, Jerry G.; Brant, Joseph F.

    1994-01-01

    The Peabody Institute of Baltimore (Maryland), the Johns Hopkins University's music school, addressed its financial problems by converting four campus buildings into an inn used to house Elderhostel participants. Annual program revenues cover all costs and yield a financial reserve for the school. (MSE)

  10. Hot Water for Motor Inn--Garland, Texas

    NASA Technical Reports Server (NTRS)

    1982-01-01

    35-page report describes solar collector system and its operation and presents projected system performance. Details calibration and maintenance procedures and lists and describes equipment that makes up system. System provides hot water for laundry, for showers and sinks in inn rooms.

  11. Indium Sorption to Iron Oxides

    NASA Astrophysics Data System (ADS)

    White, S. J.; Sacco, S. A.; Hemond, H.; Hussain, F. A.; Runkel, R. L.; Walton-Day, K. E.; Kimball, B. A.; Shine, J. P.

    2014-12-01

    Indium is an increasingly important metal in semiconductors and electronics, and its use is growing rapidly as a semiconductive coating (as indium tin oxide) for liquid crystal displays (LCDs) and flat panel displays. It also has uses in important energy technologies such as light emitting diodes (LEDs) and photovoltaic cells. Despite its rapid increase in use, very little is known about the environmental behavior of indium, and concerns are being raised over the potential health effects of this emerging metal contaminant. One source of indium to the environment is acid mine drainage from the mining of lead, zinc, and copper sulfides. In our previous studies of a stream in Colorado influenced by acid mine drainage from lead and zinc mining activities, indium concentrations were found to be 10,000 times those found in uncontaminated rivers. However, the speciation and mobility of indium could not be reliably modeled because sorption constants to environmental sorbents have not been determined. In this study, we generate sorption constants for indium to ferrihydrite in the laboratory over a range of pHs, sorbent to sorbate ratios, and ionic strengths. Ferrihydrite is one of the most important sorbents in natural systems, and sorption to amorphous iron oxides such as ferrihydrite is thought to be one of the main removal mechanisms of metals from the dissolved phase in aqueous environments. Because of its relatively low solubility, we also find that indium hydroxide precipitation can dominate indium's partitioning at micromolar concentrations of indium. This precipitation may be important in describing indium's behavior in our study stream in Colorado, where modeling sorption to iron-oxides does not explain the complete removal of indium from the dissolved phase when the pH of the system is artificially raised to above 8. This study contributes much-needed data about indium's aqueous behavior, in order to better understand its fate, transport, and impacts in the

  12. Inexpensive Method for Coating the Interior of Silica Growth Ampoules with Pyrolytic Boron Nitride

    NASA Technical Reports Server (NTRS)

    Wang, Jianbin; Regel, Liya L.; Wilcox, William R.

    2003-01-01

    An inexpensive method was developed for coating the interior of silica ampoules with hexagonal boron nitride. An aqueous solution of boric acid was used to coat the ampoule prior to drying in a vacuum at 200 C. This coating was converted to transparent boron nitride by heating in ammonia at 1000 C. Coated ampoules were used to achieve detached solidification of indium antimonide on earth.

  13. Precursors for formation of copper selenide, indium selenide, copper indium diselenide, and/or copper indium gallium diselenide films

    SciTech Connect

    Curtis, Calvin J; Miedaner, Alexander; Van Hest, Maikel; Ginley, David S

    2014-11-04

    Liquid-based precursors for formation of Copper Selenide, Indium Selenide, Copper Indium Diselenide, and/or copper Indium Galium Diselenide include copper-organoselenides, particulate copper selenide suspensions, copper selenide ethylene diamine in liquid solvent, nanoparticulate indium selenide suspensions, and indium selenide ethylene diamine coordination compounds in solvent. These liquid-based precursors can be deposited in liquid form onto substrates and treated by rapid thermal processing to form crystalline copper selenide and indium selenide films.

  14. High pressure nitriding

    SciTech Connect

    Jung, M.; Hoffmann, F.T.; Mayr, P.; Minarski, P.

    1995-12-31

    The aim of the presented research project is the development of a new high pressure nitriding process, which avoids disadvantages of conventional nitriding processes and allows for new applications. Up to now, a nitriding furnace has been constructed and several investigations have been made in order to characterize the influence of pressure on the nitriding process. In this paper, connections between pressure in the range of 2 to 12 atm and the corresponding nitride layer formation for the steel grades AISI 1045, H11 and a nitriding steel are discussed. Results of the nitride layer formation are presented. For all steel grades, a growth of nitride layers with increasing pressure was obtained. Steels with passive layers, as the warm working steel H11, showed a better nitriding behavior at elevated pressure.

  15. Auger Recombination in Indium Gallium Nitride: Experimental Evidence

    NASA Astrophysics Data System (ADS)

    Krames, Michael

    2010-03-01

    Progress in InGaN-based light-emitting diode (LED) technology has resulted in white-light emitters with efficiencies far exceeding those of conventional light sources such as tungsten-filament-based incandescence and mercury-vapor based fluorescence. Indeed, by now efficacies exceeding 150 lumens per Watt for InGaN-based phosphor-converted white LEDs are claimed, which represent a 90% energy savings compared to the conventional incandescent (i.e., ``light bulb'') solution. However, these high performance levels are obtained under conditions of very low forward current-density for the InGaN LED and do not represent true operating conditions (nor cost-effective utilization) for the device. In order to reduce the cost (and thus increase market penetration of) solid-state lighting, more lumens per unit of semiconductor area are required which in practice necessitates higher drive current densities. Unfortunately, at these higher driver current densities, the internal quantum efficiency of InGaN-based LEDs is observed to decrease significantly. In the fall of 2007, researchers at the Advanced Laboratories of Philips Lumileds were the first to propose Auger recombination as the root-cause mechanism in InGaN which was behind this ``efficiency droop'' [1]. They further proposed to circumvent the problem by employing InGaN-based active region designs that maintain low carrier density, and demonstrated an LED device design that reaches a maximum quantum efficiency above 200 A/cm2, compared to ˜1-10 A/cm^2 for typical multiple-quantum-well heterostructures [2]. In this talk we will review the experimental evidence for Auger recombination in InGaN, beginning with the early work from 2007 and then considering additional work from more recent efforts to better understand the details behind this loss mechanism. [4pt] [1] Y. C. Shen, G. O. M"uller, S. Watanabe, N. F. Gardner, A. Munkholm, and M. R. Krames, ``Auger recombination in InGaN measured by photoluminescence'', Appl. Phys. Lett. 91, 141101 (2007). [0pt] [2] N. F. Gardner, G. O. M"uller, Y. C. Shen, G. Chen, S. Watanabe, W. G"otz, and M. R. Krames, ``Blue-emitting InGaN--GaN double-heterostructure light-emitting diodes reaching maximum quantum efficiency above 200 A/cm^2'', Appl. Phys. Lett. 91, 243506 (2007).

  16. Nanostructures of Indium Gallium Nitride Crystals Grown on Carbon Nanotubes

    PubMed Central

    Park, Ji-Yeon; Man Song, Keun; Min, Yo-Sep; Choi, Chel-Jong; Seok Kim, Yoon; Lee, Sung-Nam

    2015-01-01

    Nanostructure (NS) InGaN crystals were grown on carbon nanotubes (CNTs) using metalorganic chemical vapor deposition. The NS-InGaN crystals, grown on a ~5-μm-long CNT/Si template, were estimated to be ~100–270 nm in size. Transmission electron microscope examinations revealed that single-crystalline InGaN NSs were formed with different crystal facets. The observed green (~500 nm) cathodoluminescence (CL) emission was consistent with the surface image of the NS-InGaN crystallites, indicating excellent optical properties of the InGaN NSs on CNTs. Moreover, the CL spectrum of InGaN NSs showed a broad emission band from 490 to 600 nm. Based on these results, we believe that InGaN NSs grown on CNTs could aid in overcoming the green gap in LED technologies. PMID:26568414

  17. Nanostructures of Indium Gallium Nitride Crystals Grown on Carbon Nanotubes.

    PubMed

    Park, Ji-Yeon; Man Song, Keun; Min, Yo-Sep; Choi, Chel-Jong; Seok Kim, Yoon; Lee, Sung-Nam

    2015-01-01

    Nanostructure (NS) InGaN crystals were grown on carbon nanotubes (CNTs) using metalorganic chemical vapor deposition. The NS-InGaN crystals, grown on a ~5-μm-long CNT/Si template, were estimated to be ~100-270 nm in size. Transmission electron microscope examinations revealed that single-crystalline InGaN NSs were formed with different crystal facets. The observed green (~500 nm) cathodoluminescence (CL) emission was consistent with the surface image of the NS-InGaN crystallites, indicating excellent optical properties of the InGaN NSs on CNTs. Moreover, the CL spectrum of InGaN NSs showed a broad emission band from 490 to 600 nm. Based on these results, we believe that InGaN NSs grown on CNTs could aid in overcoming the green gap in LED technologies. PMID:26568414

  18. Nanostructures of Indium Gallium Nitride Crystals Grown on Carbon Nanotubes

    NASA Astrophysics Data System (ADS)

    Park, Ji-Yeon; Man Song, Keun; Min, Yo-Sep; Choi, Chel-Jong; Seok Kim, Yoon; Lee, Sung-Nam

    2015-11-01

    Nanostructure (NS) InGaN crystals were grown on carbon nanotubes (CNTs) using metalorganic chemical vapor deposition. The NS-InGaN crystals, grown on a ~5-μm-long CNT/Si template, were estimated to be ~100-270 nm in size. Transmission electron microscope examinations revealed that single-crystalline InGaN NSs were formed with different crystal facets. The observed green (~500 nm) cathodoluminescence (CL) emission was consistent with the surface image of the NS-InGaN crystallites, indicating excellent optical properties of the InGaN NSs on CNTs. Moreover, the CL spectrum of InGaN NSs showed a broad emission band from 490 to 600 nm. Based on these results, we believe that InGaN NSs grown on CNTs could aid in overcoming the green gap in LED technologies.

  19. Growth of Mg-doped InN by Metal Organic Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Khan, N.; Nepal, N.; Lin, J. Y.; Jiang, H. X.

    2007-03-01

    InN with an energy gap of ˜ 0.7 eV, has recently attracted extensive attention due to its potential applications in semiconductor devices such as light emitting diodes, lasers, and high efficiency solar cells. However the ability to grow both p-type and n-type InN is essential to realize these devices. All as grown unintentionally doped InN are n-type. The tendency of native defects in InN to form donors manifests itself severely at surfaces where high levels of electron accumulation are observed. The highly n-type conductive layer at the surface of InN films creates difficulties in the demonstration of p-type InN. Nevertheless it is important to investigate the optical and structural properties of Mg-doped InN. We report here on the growth of Mg-doped InN epilayers by metal organic chemical vapor deposition. Photoluminescence (PL) was employed to study the effects of different growth conditions of Mg-doped InN. PL studies revealed that in addition to emission peak at ˜ 0.82 eV in undoped InN layers, Mg-doped InN layers exhibit an emission peak at ˜ 0.75 eV. The peak at ˜ 0.75eV for Mg-doped InN could be related to defects generated by Mg doping in InN. Various other measurements such as Hall effect measurement, X-ray diffraction and atomic force microscopy were carried out to provide further understanding.

  20. Temperature switching of cavity modes in InN microcrystals

    SciTech Connect

    Kazanov, D. R. Kaibyshev, V. H.; Davydov, V. Yu.; Smirnov, A. N.; Jmerik, V. N.; Kuznetsova, N. V.; Kopiev, P. S.; Ivanov, S. V.; Shubina, T. V.

    2015-11-15

    InN optical cavities supporting low-order whispering-gallery modes up to room temperature are formed by molecular-beam epitaxy on patterned substrates. The observed switching of the mode type with increasing temperature is explained in terms of changes in the optical parameters due to a shift of the absorption edge and modification of its shape. Modeling taking into account a variation in the refractive index reproduces the typical distributions of the electromagnetic-field intensity in the cavities.

  1. Mineral of the month: indium

    USGS Publications Warehouse

    George, Micheal W.

    2004-01-01

    Indium was discovered in Germany in 1863. Although it is a lustrous silver-white color, the finders named the new material for the “indigo” spectral lines the mineral created on the spectrograph. Indium ranks 61st in abundance in Earth’s crust and is about three times more abundant than silver or mercury.

  2. Preparation of uranium nitride

    DOEpatents

    Potter, Ralph A.; Tennery, Victor J.

    1976-01-01

    A process for preparing actinide-nitrides from massive actinide metal which is suitable for sintering into low density fuel shapes by partially hydriding the massive metal and simultaneously dehydriding and nitriding the dehydrided portion. The process is repeated until all of the massive metal is converted to a nitride.

  3. Dry etching of III-V nitrides

    SciTech Connect

    Pearton, S.J.; Shul, R.J.; McLane, G.F.; Constantine, C.

    1995-12-01

    The chemical inertness and high bond strengths of the III-V nitrides lead to slower plasma etching rates than for more conventional III-V semiconductors under the same conditions. High ion density conditions (>3{times}l0{sup 9}cm{sup {minus}3}) such as those obtained in ECR or magnetron reactors produce etch rates up to an order of magnitude higher than for RIE, where the ion densities are in the 10{sup 9}cm{sup {minus}3} range. We have developed smooth anisotropic dry etches for GaN, InN, AlN and their alloys based on Cl{sub 2}/CH{sub 4}/H{sub 2}/Ar, BCl{sub 3}/Ar, Cl{sub 2}/H{sub 2}, Cl{sub 2}/SF{sub 6}, HBr/H{sub 2} and HI/H{sub 2} plasma chemistries achieving etch rates up to {approximately}4,000{angstrom}/min at moderate dc bias voltages ({le}-150V). Ion-induced damage in the nitrides appears to be less apparent than in other III-V`s. One of the key remaining issues is the achievement of high selectivities for removal of one layer from another.

  4. Convergence of valence bands for high thermoelectric performance for p-type InN

    NASA Astrophysics Data System (ADS)

    Li, Hai-Zhu; Li, Ruo-Ping; Liu, Jun-Hui; Huang, Ming-Ju

    2015-12-01

    Band engineering to converge the bands to achieve high valley degeneracy is one of effective approaches for designing ideal thermoelectric materials. Convergence of many valleys in the valence band may lead to a high Seebeck coefficient, and induce promising thermoelectric performance of p-type InN. In the current work, we have systematically investigated the electronic structure and thermoelectric performance of wurtzite InN by using the density functional theory combined with semiclassical Boltzmann transport theory. Form the results, it can be found that intrinsic InN has a large Seebeck coefficient (254 μV/K) and the largest value of ZeT is 0.77. The transport properties of p-type InN are better than that of n-type one at the optimum carrier concentration, which mainly due to the large Seebeck coefficient for p-type InN, although the electrical conductivity of n-type InN is larger than that of p-type one. We found that the larger Seebeck coefficient for p-type InN may originate from the large valley degeneracy in the valence band. Moreover, the low minimum lattice thermal conductivity for InN is one key factor to become a good thermoelectric material. Therefore, p-type InN could be a potential material for further applications in the thermoelectric area.

  5. Transmission Electron Microscopy Study of InN Nanorods

    SciTech Connect

    Liliental-Weber, Z.; Li, X.; Kryliouk, Olga; Park, H.J.; Mangum,J.; Anderson, T.

    2006-07-13

    InN nanorods were grown on a, c-, and r-plane of sapphire and also on Si (111) and GaN (0001) by non-catalytic, template-free hydride metal-organic vapor phase epitaxy and studied by transmission electron microscopy, electron energy loss (EELS) and photoluminescence (PL) at room temperature. These nanocrystals have different shapes and different faceting depending on the substrate used and their crystallographic orientation. EELS measurements have confirmed the high purity of these crystals. The observed PL peak was in the range of 0.9-0.95 eV. The strongest PL intensity was observed for the nanocrystals with the larger diameters.

  6. Indium Second-Surface Mirrors

    NASA Technical Reports Server (NTRS)

    Bouquet, F. L.; Hasegawa, T.

    1982-01-01

    Second-surface mirrors are formed by vapor deposition of indium onto glass. Mirrors have reflectances comparable to those of ordinary silver or aluminized mirrors and are expected to show superior corrosion resistance. Mirrors may be used in solar concentrators.

  7. Evaluation of threading dislocation densities in In- and N-face InN

    SciTech Connect

    Gallinat, C. S.; Koblmueller, G.; Wu, Feng; Speck, J. S.

    2010-03-15

    The threading dislocation (TD) structure and density has been studied in In- and N-face InN films grown on GaN by plasma-assisted molecular beam epitaxy. The TD densities were determined by nondestructive x-ray diffraction rocking curve measurements in on-axis symmetric and off-axis skew symmetric geometries and calibrated by transmission electron microscopy measurements. TD densities were dominated by edge-type TDs with screw-component TDs accounting for less than 10% of the total TD density. A significant decrease in edge-type TD density was observed for In-face InN films grown at increasingly higher substrate temperatures. In-face InN films grown with excess In exhibited lower TD densities compared to films grown under N-rich conditions. The edge-type TD density of N-face InN films was independent of substrate temperature due to the higher allowable growth temperatures for N-face InN compared to In-face InN. TD densities in In-face InN also showed a strong dependence on film thickness. Films grown at a thickness of less than 1 {mu}m had higher TD densities compared with films grown thicker than 1 {mu}m. The lowest measured TD density for an In-face InN film was {approx}1.5x10{sup 10}/cm{sup 2} for 1 {mu}m thick films.

  8. Donor and acceptor concentrations in degenerate InN

    SciTech Connect

    Look, D.C.; Lu, H.; Schaff, W.J.; Jasinski, J.; Liliental-Weber, Z.

    2002-01-28

    A formalism is presented to determine donor (N{sub D}) and acceptor (N{sub A}) concentrations in wurtzitic InN characterized by degenerate carrier concentration (n) and mobility ({mu}). The theory includes scattering not only by charged point defects and impurities, but also by charged threading dislocations, of concentration N{sub dis}. For an 0.45-{micro}m-thick InN layer grown on Al{sub 2}O{sub 3} by molecular beam epitaxy, having N{sub dis} = 5 x 10{sup 10} cm{sup -2}, determined by transmission electron microscopy, n(20 K) = 3.5 x 10{sup 18} cm{sup -3}, and {mu}(20 K) = 1055 cm{sup 2}/V-s, determined by Hall-effect measurements, the fitted values are N{sub D} = 4.7 x 10{sup 18} cm{sup -3} and N{sub A} = 1.2 x 10{sup 18} cm{sup -3}. The identities of the donors and acceptors are not known, although a comparison of N{sub D} with analytical data, and also with calculations of defect formation energies, suggests that a potential candidate for the dominant donor is H.

  9. Methods of forming boron nitride

    SciTech Connect

    Trowbridge, Tammy L; Wertsching, Alan K; Pinhero, Patrick J; Crandall, David L

    2015-03-03

    A method of forming a boron nitride. The method comprises contacting a metal article with a monomeric boron-nitrogen compound and converting the monomeric boron-nitrogen compound to a boron nitride. The boron nitride is formed on the same or a different metal article. The monomeric boron-nitrogen compound is borazine, cycloborazane, trimethylcycloborazane, polyborazylene, B-vinylborazine, poly(B-vinylborazine), or combinations thereof. The monomeric boron-nitrogen compound is polymerized to form the boron nitride by exposure to a temperature greater than approximately 100.degree. C. The boron nitride is amorphous boron nitride, hexagonal boron nitride, rhombohedral boron nitride, turbostratic boron nitride, wurzite boron nitride, combinations thereof, or boron nitride and carbon. A method of conditioning a ballistic weapon and a metal article coated with the monomeric boron-nitrogen compound are also disclosed.

  10. Photoluminescence properties of Mg-doped InN nanowires

    SciTech Connect

    Zhao, Songrui; Liu, Xuedong; Mi, Zetian

    2013-11-11

    In this work, photoluminescence (PL) properties of nearly defect-free Mg-doped InN nanowires were investigated in detail. The low-doped sample exhibits two PL emission peaks up to 152 K, which can be ascribed to the band-to-band recombination and the Mg-acceptor energy level related recombination, respectively. For the high-doped sample, the Mg-acceptor energy level related transition dominates. Detailed power dependent PL studies further indicate that the Mg-acceptor energy level related PL emission is due to the donor-acceptor pair recombination process, which subsequently evolves into the free-to-acceptor recombination with increasing temperature.

  11. Indium oxide based fiber optic SPR sensor

    NASA Astrophysics Data System (ADS)

    Shukla, Sarika; Sharma, Navneet K.

    2016-05-01

    Surface plasmon resonance based fiber optic sensor using indium oxide layer is presented and theoretically studied. It has been found that with increase in thickness of indium oxide layer beyond 170 nm, the sensitivity of SPR sensor decreases. 170 nm thick indium oxide layer based SPR sensor holds maximum sensitivity.

  12. Indium Foil Serves As Thermally Conductive Gasket

    NASA Technical Reports Server (NTRS)

    Eastman, G. Yale; Dussinger, Peter M.

    1993-01-01

    Indium foil found useful as gasket to increase thermal conductance between bodies clamped together. Deforms to fill imperfections on mating surfaces. Used where maximum temperature in joint less than melting temperature of indium. Because of low melting temperature of indium, most useful in cryogenic applications.

  13. Formation of copper-indium-selenide and/or copper-indium-gallium-selenide films from indium selenide and copper selenide precursors

    DOEpatents

    Curtis, Calvin J.; Miedaner, Alexander; Van Hest, Maikel; Ginley, David S.; Nekuda, Jennifer A.

    2011-11-15

    Liquid-based indium selenide and copper selenide precursors, including copper-organoselenides, particulate copper selenide suspensions, copper selenide ethylene diamine in liquid solvent, nanoparticulate indium selenide suspensions, and indium selenide ethylene diamine coordination compounds in solvent, are used to form crystalline copper-indium-selenide, and/or copper indium gallium selenide films (66) on substrates (52).

  14. V-shaped inversion domains in InN grown on c-plane sapphire

    SciTech Connect

    Jasinski, J.; Liliental-Weber, Z.; Lu, H.; Schaff, W.J.

    2004-04-27

    Inversion domains with a V-shape were found to nucleate inside a Mg-doped InN heteroepitaxial layer. They resemble Al-polarity domains, observed recently, in N-polarity AlN films. However, the angle between the side-walls of the V-shaped domain and the c-axis differs in these two cases. In InN, this angle is almost two times bigger than that reported for AlN. The origin of V-shaped inversion domains in InN film is not yet clear.

  15. Superconducting structure with layers of niobium nitride and aluminum nitride

    DOEpatents

    Murduck, James M.; Lepetre, Yves J.; Schuller, Ivan K.; Ketterson, John B.

    1989-01-01

    A superconducting structure is formed by depositing alternate layers of aluminum nitride and niobium nitride on a substrate. Deposition methods include dc magnetron reactive sputtering, rf magnetron reactive sputtering, thin-film diffusion, chemical vapor deposition, and ion-beam deposition. Structures have been built with layers of niobium nitride and aluminum nitride having thicknesses in a range of 20 to 350 Angstroms. Best results have been achieved with films of niobium nitride deposited to a thickness of approximately 70 Angstroms and aluminum nitride deposited to a thickness of approximately 20 Angstroms. Such films of niobium nitride separated by a single layer of aluminum nitride are useful in forming Josephson junctions. Structures of 30 or more alternating layers of niobium nitride and aluminum nitride are useful when deposited on fixed substrates or flexible strips to form bulk superconductors for carrying electric current. They are also adaptable as voltage-controlled microwave energy sources.

  16. Superconducting structure with layers of niobium nitride and aluminum nitride

    DOEpatents

    Murduck, J.M.; Lepetre, Y.J.; Schuller, I.K.; Ketterson, J.B.

    1989-07-04

    A superconducting structure is formed by depositing alternate layers of aluminum nitride and niobium nitride on a substrate. Deposition methods include dc magnetron reactive sputtering, rf magnetron reactive sputtering, thin-film diffusion, chemical vapor deposition, and ion-beam deposition. Structures have been built with layers of niobium nitride and aluminum nitride having thicknesses in a range of 20 to 350 Angstroms. Best results have been achieved with films of niobium nitride deposited to a thickness of approximately 70 Angstroms and aluminum nitride deposited to a thickness of approximately 20 Angstroms. Such films of niobium nitride separated by a single layer of aluminum nitride are useful in forming Josephson junctions. Structures of 30 or more alternating layers of niobium nitride and aluminum nitride are useful when deposited on fixed substrates or flexible strips to form bulk superconductors for carrying electric current. They are also adaptable as voltage-controlled microwave energy sources. 8 figs.

  17. Indium droplet formation in InGaN thin films with single and double heterojunctions prepared by MOCVD

    PubMed Central

    2014-01-01

    Indium gallium nitride (InGaN) samples with single heterojunction (SH) and double heterojunction (DH) were prepared using metal-organic chemical vapor deposition. SH has a layer of InGaN thin film (thicknesses, 25, 50, 100, and 200 nm) grown on an uGaN film (thickness, 2 μm). The DH samples are distinguished by DH uGaN film (thickness, 120 nm) grown on the InGaN layer. Reciprocal space mapping measurements reveal that the DH samples are fully strained with different thicknesses, whereas the strain in the SH samples are significantly relaxed with the increasing thickness of the InGaN film. Scanning electron microscopy results show that the surface roughness of the sample increases when the sample is relaxed. High-resolution transmission electron microscopy images of the structure of indium droplets in the DH sample indicate that the thickness of the InGaN layer decreases with the density of indium droplets. The formation of these droplets is attributed to the insufficient kinetic energy of indium atom to react with the elements of group V, resulting to aggregation. The gallium atoms in the GaN thin film will not be uniformly replaced by indium atoms; the InGaN thin film has an uneven distribution of indium atoms and the quality of the epitaxial layer is degraded. PMID:25024692

  18. Method for preparing actinide nitrides

    DOEpatents

    Bryan, G.H.; Cleveland, J.M.; Heiple, C.R.

    1975-12-01

    Actinide nitrides, and particularly plutonium and uranium nitrides, are prepared by reacting an ammonia solution of an actinide compound with an ammonia solution of a reactant or reductant metal, to form finely divided actinide nitride precipitate which may then be appropriately separated from the solution. The actinide nitride precipitate is particularly suitable for forming nuclear fuels.

  19. Anomalous phase transition of InN nanowires under high pressure

    NASA Astrophysics Data System (ADS)

    Tang, Shun-Xi; Zhu, Hong-Yang; Jiang, Jun-Ru; Wu, Xiao-Xin; Dong, Yun-Xuan; Zhang, Jian; Yang, Da-Peng; Cui, Qi-Liang

    2015-09-01

    Uniform InN nanowires were studied under pressures up to 35.5 GPa by using in situ synchrotron radiation x-ray diffraction technique at room temperature. An anomalous phase transition behavior has been discovered. Contrary to the results in the literature, which indicated that InN undergoes a fully reversible phase transition from the wurtzite structure to the rocksalt type structure, the InN nanowires in this study unusually showed a partially irreversible phase transition. The released sample contained the metastable rocksalt phase as well as the starting wurtzite one. The experimental findings of this study also reveal the potentiality of high pressure techniques to synthesize InN nanomaterials with the metastable rocksalt type structure, in addition to the generally obtained zincblende type one. Project supported by the National Natural Science Foundation of China (Grant Nos. 50772043, 51172087, and 11074089).

  20. Growth and depth dependence of visible luminescence in wurtzite InN epilayers

    SciTech Connect

    Pu, X.D.; Shen, W.Z.; Zhang, Z.Q.; Ogawa, H.; Guo, Q.X.

    2006-04-10

    We present detailed investigation of growth and depth dependence of visible ({approx}1.9 eV) photoluminescence (PL) in wurtzite InN epilayers grown by magnetron sputtering. For normal surface incidence, PL peak was found to redshift with increasing growth temperatures. Cross-sectional PL measurements were able to separate contributions from the InN epilayers and sapphire substrates, which not only demonstrated the visible luminescence in InN but also revealed the blueshift of the PL peak with laser spot focusing from epilayer surface toward the interface. The results have been well explained by the growth mechanism and residual strain along growth direction of InN epilayers.

  1. Highly efficient potentiometric glucose biosensor based on functionalized InN quantum dots

    NASA Astrophysics Data System (ADS)

    Alvi, N. H.; Soto Rodriguez, P. E. D.; Gómez, V. J.; Kumar, Praveen; Amin, G.; Nur, O.; Willander, M.; Nötzel, R.

    2012-10-01

    We present a fast, highly sensitive, and efficient potentiometric glucose biosensor based on functionalized InN quantum-dots (QDs). The InN QDs are grown by molecular beam epitaxy. The InN QDs are bio-chemically functionalized through physical adsorption of glucose oxidase (GOD). GOD enzyme-coated InN QDs based biosensor exhibits excellent linear glucose concentration dependent electrochemical response against an Ag/AgCl reference electrode over a wide logarithmic glucose concentration range (1 × 10-5 M to 1 × 10-2 M) with a high sensitivity of 80 mV/decade. It exhibits a fast response time of less than 2 s with good stability and reusability and shows negligible response to common interferents such as ascorbic acid and uric acid. The fabricated biosensor has full potential to be an attractive candidate for blood sugar concentration detection in clinical diagnoses.

  2. Improvement of structural and electrical properties of Cu2O films with InN epilayers

    NASA Astrophysics Data System (ADS)

    Pan, Yang; Wang, Zheng; Peng, Ting; Wu, Kemin; Wu, Hao; Liu, Chang

    2011-11-01

    Epitaxial single crystalline Cu2O thin films were synthesized by thermal oxidation of Cu films, which were deposited on InN/sapphire using electron beam evaporation. Cu2O on InN shows a better crystalline quality than that on GaN due to a 30° in-plane rotation between Cu2O and InN, which results in a smaller lattice mismatch. As-oxidized Cu2O on GaN or on InN shows an n-type conducting behavior, however, as-oxidized Cu2O on InN presents a higher resistance and a lower electron concentration. A transition from n- to p-type is found after the Cu2O thin films are annealed at 500 °C in vacuum. A less Cu2+ absorption of the Cu2O/InN plays an important role to determine the conductive type.

  3. Mg acceptor level in InN epilayers probed by photoluminescence

    NASA Astrophysics Data System (ADS)

    Khan, N.; Nepal, N.; Sedhain, A.; Lin, J. Y.; Jiang, H. X.

    2007-07-01

    Mg-doped InN epilayers were grown on sapphire substrates by metal organic chemical vapor deposition. Effects of Mg concentration on the photoluminescence (PL) emission properties have been investigated. An emission line at ˜0.76eV, which was absent in undoped InN epilayers and was about 60meV below the band-to-band emission peak at ˜0.82eV, was observed to be the dominant emission in Mg-doped InN epilayers. The PL spectral peak position and the temperature dependent emission intensity corroborated each other and suggested that the Mg acceptor level in InN is about 60meV above the valance band maximum.

  4. The Place Where Hope Lives: The Children's Inn Comforts Kids and Their Families

    MedlinePlus

    ... Lives: The Children's Inn Comforts Kids and Their Families Past Issues / Fall 2006 Table of Contents For ... home for children with serious illnesses and their families. Meet Channing O'Halloran. Before she was 1 ...

  5. Transport and infrared photoresponse properties of InN nanorods/Si heterojunction

    PubMed Central

    2011-01-01

    The present work explores the electrical transport and infrared (IR) photoresponse properties of InN nanorods (NRs)/n-Si heterojunction grown by plasma-assisted molecular beam epitaxy. Single-crystalline wurtzite structure of InN NRs is verified by the X-ray diffraction and transmission electron microscopy. Raman measurements show that these wurtzite InN NRs have sharp peaks E2(high) at 490.2 cm-1 and A1(LO) at 591 cm-1. The current transport mechanism of the NRs is limited by three types of mechanisms depending on applied bias voltages. The electrical transport properties of the device were studied in the range of 80 to 450 K. The faster rise and decay time indicate that the InN NRs/n-Si heterojunction is highly sensitive to IR light. PMID:22122843

  6. Growth of a-Plane InN Film and Its THz Emission

    NASA Astrophysics Data System (ADS)

    Wang, Guang-Bing; Zhao, Guo-Zhong; Zheng, Xian-Tong; Wang, Ping; Chen, Guang; Rong, Xin; Wang, Xin-Qiang

    2014-07-01

    We report the growth of a-plane InN on an r-plane sapphire substrate by plasma-assisted molecular-beam epitaxy. It is found that the a-plane InN is successfully grown by using a GaN buffer layer, which has been confirmed by reflection high-energy electron diffraction, x-ray diffraction and Raman scattering measurements. The Hall effect measurement shows that the electron mobility of the as-grown a-plane InN is about 406 cm2 /V·s with a residual electron concentration of 5.7 × 10 cm-3. THz emission from the a-plane InN film is also studied, where it is found that the emission amplitude is inversely proportional to the conductivity.

  7. Boron nitride: Composition, optical properties and mechanical behavior

    NASA Technical Reports Server (NTRS)

    Pouch, John J.; Alterovitz, Samuel A.; Miyoshi, Kazuhisa; Warner, Joseph D.

    1987-01-01

    A low energy ion beam deposition technique was used to grow boron nitride films on quartz, germanium, silicon, gallium arsenide, and indium phosphate. The film structure was amorphous with evidence of a hexagonal phase. The peak boron concentration was 82 at %. The carbon and oxygen impurities were in the 5 to 8 at % range. Boron-nitrogen and boron-boron bonds were revealed by X-ray photoelectron spectroscopy. The index of refraction varied from 1.65 to 1.67 for films deposited on III-V compound semiconductors. The coefficient of friction for boron nitride in sliding contact with diamond was less than 0.1. The substrate was silicon.

  8. Ultra-low threshold gallium nitride photonic crystal nanobeam laser

    SciTech Connect

    Niu, Nan Woolf, Alexander; Wang, Danqing; Hu, Evelyn L.; Zhu, Tongtong; Oliver, Rachel A.; Quan, Qimin

    2015-06-08

    We report exceptionally low thresholds (9.1 μJ/cm{sup 2}) for room temperature lasing at ∼450 nm in optically pumped Gallium Nitride (GaN) nanobeam cavity structures. The nanobeam cavity geometry provides high theoretical Q (>100 000) with small modal volume, leading to a high spontaneous emission factor, β = 0.94. The active layer materials are Indium Gallium Nitride (InGaN) fragmented quantum wells (fQWs), a critical factor in achieving the low thresholds, which are an order-of-magnitude lower than obtainable with continuous QW active layers. We suggest that the extra confinement of photo-generated carriers for fQWs (compared to QWs) is responsible for the excellent performance.

  9. Dynamic atomic layer epitaxy of InN on/in +c-GaN matrix: Effect of "In+N" coverage and capping timing by GaN layer on effective InN thickness

    NASA Astrophysics Data System (ADS)

    Yoshikawa, Akihiko; Kusakabe, Kazuhide; Hashimoto, Naoki; Hwang, Eun-Sook; Itoi, Takaomi

    2016-01-01

    The growth front in the self-organizing and self-limiting epitaxy of ˜1 monolayer (ML)-thick InN wells on/in +c-GaN matrix by molecular beam epitaxy (MBE) has been studied in detail, with special attention given to the behavior and role of the N atoms. The growth temperatures of interest are above 600 °C, far higher than the typical upper critical temperature of 500 °C in MBE. It was confirmed that 2 ML-thick InN wells can be frozen/inserted in GaN matrix at 620 °C, but it was found that N atoms at the growth front tend to selectively re-evaporate more quickly than In atoms at temperatures higher than 650 °C. As a result, the effective thickness of inserted InN wells in the GaN matrix at 660-670 °C were basically 1 ML or sub-ML, even though they were capped by a GaN barrier at the time of 2 ML "In+N" coverage. Furthermore, it was found that the N atoms located below In atoms in the dynamic atomic layer epitaxy growth front had remarkably weaker bonding to the +c-GaN surface.

  10. Electronic structure calculations of group III nitride clusters

    NASA Astrophysics Data System (ADS)

    Kandalam, Anil Kumar

    2002-04-01

    Group III nitrides have become materials of choice in the manufacturing of devices used in opto-electronic and high-temperature high-power electronic industries. Hence, these materials received wide attention and have become the focus of several theoretical and experimental studies. Though these materials are studied in bulk and thin film forms, research at the cluster level is still lacking. Hence, a first principles calculation, based on the Generalized Gradient Approximation (GGA) to Density Functional Theory (DFT) was initiated to study the structural and electronic properties of AlnN n, GanNn, and InnNn, (n = 1--6) clusters. The calculated results show that the small polyatomic nitride clusters (monomer, triatomic and dimer) have a strong tendency to form N-N multiple bonds leading to the weakening of any existent metal-N or metal-metal bonds. In the absence of the N-N bonds, the metal-nitrogen bond dominates, forming short bond-lengths and large force constants. However, the strength of these heteronuclear bonds decreases in going from Al to Ga and In, whereas the weak metal-metal bond increases its strength from Al to Ga to In in the nitride clusters. Starting from the trimers M3N3, a distinct structural difference between the lowest energy configurations of AlnNn and that of GanNn, and In nNn, clusters has been observed. For AlnNn, clusters, the metal-nitrogen bond is found to dominate the lowest energy configurations. As the cluster size is increased from Al3N3 to Al 6N6, a transition from planar ring structures towards a bulk-like three dimensional configurations is seen. However, in GanN n, and InnNn clusters, no such trend is observed and the lowest energy configurations are dominated either by N2 or (N3)- sub-units. The segregation of N atoms within the stoichiometric clusters indicates the possibility of N2 and N3 based defects in the thin-film deposition process which may affect the quality of the thin-film devices based on Group III nitrides.

  11. First-principles study of optical properties of InN nanosheet

    NASA Astrophysics Data System (ADS)

    Sarmazdeh, Masoud Majidiyan; Mendi, Roohallah Taghavi; Zelati, Amir; Boochani, Arash; Nofeli, Fariba

    2016-05-01

    Based on density functional theory (DFT), some optical properties of InN nanosheet, such as dielectric function, energy loss function, refractive index, reflectivity and absorption coefficient, have been calculated using the modified Becke-Johnson (mBJ) exchange-correlation potential and full potential-linearized augmented plane waves (FP-LAPW) method. The study of dielectric function show that optical properties of InN nanosheet are anisotropic and important energy range in the optical process is between low energies to 20 eV. The results indicate the plasmon energy of InN nanosheet occurs in the lower energy than bulk InN and in addition the plasmon energy in the in-plane direction is different from that perpendicular to the in-plane direction. The obtained optical gaps are 1.2 eV and 3.6 eV in perpendicular and parallel to c-axis, respectively. Study of refractive index and optical reflectivity shows that the superluminal phenomena occur in the several energy ranges for the InN nanosheet and this nanosheet has high transparency in a wide energy range. The results propose that the InN nanosheet is a good candidate for the optical communications applications, optoelectronics devices and transparent coatings.

  12. Growth of very large InN microcrystals by molecular beam epitaxy using epitaxial lateral overgrowth

    SciTech Connect

    Kamimura, J.; Kishino, K.; Kikuchi, A.

    2015-02-28

    Very thick InN (∼40 μm) was grown by molecular beam epitaxy using the epitaxial lateral overgrowth (ELO) technique. In some regions, the ELO of InN was observed as expected, indicating an important step toward fabricating quasi-bulk InN substrates. Interestingly, most parts of the sample consist of large flat-topped microcrystals and well-faceted microstructures. This is likely due to local growth condition variations during ELO, which is supported by an experiment where ELO of InN was performed on a substrate with various stripe mask patterns. TEM characterization of a flat top InN microcrystal revealed few stacking faults and only related threading dislocations. Defect-free small faceted microcrystals were also observed. The thick InN crystals show a narrow photoluminescence spectrum with a peak at 0.679 eV and linewidth of 16.8 meV at 4 K.

  13. Synthesis of aluminium nitride/boron nitride composite materials

    SciTech Connect

    Xiao, T.D. . Polymer Science Program and Dept. of Chemistry); Gonsalves, K.E. . Polymer Science Program and Dept. of Chemistry Univ. of Connecticut, Storrs, CT . Dept. of Chemistry); Strutt, P.R. . Dept. of Metallurgy)

    1993-04-01

    Aluminum nitride/boron nitride composite was synthesized by using boric acid, urea, and aluminum chloride (or aluminum lactate) as the starting compounds. The starting materials were dissolved in water and mixed homogeneously. Ammonolysis of this aqueous solution resulted in the formation of a precomposite gel, which converted into the aluminum nitride/boron nitride composite on further heat treatment. Characterization of both the precomposite and the composite powders included powder X-ray diffraction, Fourier transform infrared spectroscopy, and scanning electron microscopy. Analysis of the composite revealed that the aluminum nitride phase had a hexagonal structure, and the boron nitride phase a turbostratic structure.

  14. Investigation of the 1987 Indianapolis Airport Ramada Inn incident.

    PubMed

    Clark, M A; Hawley, D A; McClain, J L; Pless, J E; Marlin, D C; Standish, S M

    1994-05-01

    On October 20, 1987, a military reserve aircraft lost power during a transcontinental flight and attempted an emergency landing at The Indianapolis International Airport. The pilot ejected and the disabled and pilotless aircraft struck a bank building. It then skidded across the street and entered the lobby of The Airport Ramada Inn where it exploded. This incident was unusual in that the fatal injuries occurred in individuals on the ground and not in the occupant of the aircraft. Seven people were killed in the lobby area and two were trapped in a laundry where they died of smoke inhalation. A tenth person died of burns ten days later. Minor injuries were reported among four hotel guests, two firefighters and the Air Force pilot. A multiagency mass disaster-plan had been formulated and rehearsed in preparation for the Panamerican Games, which had been held in Indianapolis in August 1987. A number of volunteers arrived before a security perimeter was established. They began an undocumented removal of the bodies from the scene and were about to remove valuables for "safekeeping" when stopped by coroners' office personnel. Fatalities resulted from smoke inhalation, burns or a combination. Bodies were identified by a combination of dental records, personal effects and visual means within 24 hours. The problems encountered in managing this disaster scene will also be compared with previously reported incidents. PMID:8006612

  15. Amber light-emitting diode comprising a group III-nitride nanowire active region

    DOEpatents

    Wang, George T.; Li, Qiming; Wierer, Jr., Jonathan J.; Koleske, Daniel

    2014-07-22

    A temperature stable (color and efficiency) III-nitride based amber (585 nm) light-emitting diode is based on a novel hybrid nanowire-planar structure. The arrays of GaN nanowires enable radial InGaN/GaN quantum well LED structures with high indium content and high material quality. The high efficiency and temperature stable direct yellow and red phosphor-free emitters enable high efficiency white LEDs based on the RGYB color-mixing approach.

  16. Gallium nitride optoelectronic devices

    NASA Technical Reports Server (NTRS)

    Chu, T. L.; Chu, S. S.

    1972-01-01

    The growth of bulk gallium nitride crystals was achieved by the ammonolysis of gallium monochloride. Gallium nitride single crystals up to 2.5 x 0.5 cm in size were produced. The crystals are suitable as substrates for the epitaxial growth of gallium nitride. The epitaxial growth of gallium nitride on sapphire substrates with main faces of (0001) and (1T02) orientations was achieved by the ammonolysis of gallium monochloride in a gas flow system. The grown layers had electron concentrations in the range of 1 to 3 x 10 to the 19th power/cu cm and Hall mobilities in the range of 50 to 100 sq cm/v/sec at room temperature.

  17. III-Nitride Vertical-Cavity Surface-Emitting Lasers

    NASA Astrophysics Data System (ADS)

    Leonard, John T.

    Vertical-cavity surface-emitting lasers (VCSELs) have a long history of development in GaAs-based and InP-based systems, however III-nitride VCSELs research is still in its infancy. Yet, over the past several years we have made dramatic improvements in the lasing characteristics of these highly complex devices. Specifically, we have reduced the threshold current density from ˜100 kA/cm2 to ˜3 kA/cm2, while simultaneously increasing the output power from ˜10 muW to ˜550 muW. These developments have primarily come about by focusing on the aperture design and intracavity contact design for flip-chip dual dielectric DBR III-nitride VCSELs. We have carried out a number of studies developing an Al ion implanted aperture (IIA) and photoelectrochemically etched aperture (PECA), while simultaneously improving the quality of tin-doped indium oxide (ITO) intracavity contacts, and demonstrating the first III-nitride VCSEL with an n-GaN tunnel junction intracavity contact. Beyond these most notable research fronts, we have analyzed numerous other parameters, including epitaxial growth, flip-chip bonding, substrate removal, and more, bringing further improvement to III-nitride VCSEL performance and yield. This thesis aims to give a comprehensive discussion of the relevant underlying concepts for nonpolar VCSELs, while detailing our specific experimental advances. In Section 1, we give an overview of the applications of VCSELs generally, before describing some of the potential applications for III-nitride VCSELs. This is followed by a summary of the different material systems used to fabricate VCSELs, before going into detail on the basic design principles for developing III-nitride VCSELs. In Section 2, we outline the basic process and geometry for fabricating flip-chip nonpolar VCSELs with different aperture and intracavity contact designs. Finally, in Section 3 and 4, we delve into the experimental results achieved in the last several years, beginning with a discussion on

  18. Electron scattering by native defects in III-V nitrides and their alloys

    SciTech Connect

    Hsu, L.; Walukiewicz, W.

    1996-03-01

    We have calculated the electron mobilities in GaN and InN taking into consideration scattering by short range potentials, in addition to all standard scattering mechanisms. These potentials are produced by the native defects which are responsible for the high electron concentrations in nominally undoped nitrides. Comparison of the calculated mobilities with experimental data shows that scattering by short range potentials is the dominant mechanism limiting the electron mobilities in unintentionally doped nitrides with large electron concentrations. In the case of Al{sub x}Ga{sub 1-x}N alloys, the reduction in the electron concentration due to the upward shift of the conduction band relative to the native defect level can account for the experimentally measured mobilities. Resonant scattering is shown to be important when the defect and Fermi levels are close in energy.

  19. Boron nitride nanotubes

    DOEpatents

    Smith, Michael W.; Jordan, Kevin; Park, Cheol

    2012-06-06

    Boron nitride nanotubes are prepared by a process which includes: (a) creating a source of boron vapor; (b) mixing the boron vapor with nitrogen gas so that a mixture of boron vapor and nitrogen gas is present at a nucleation site, which is a surface, the nitrogen gas being provided at a pressure elevated above atmospheric, e.g., from greater than about 2 atmospheres up to about 250 atmospheres; and (c) harvesting boron nitride nanotubes, which are formed at the nucleation site.

  20. Boron nitride composites

    DOEpatents

    Kuntz, Joshua D.; Ellsworth, German F.; Swenson, Fritz J.; Allen, Patrick G.

    2016-02-16

    According to one embodiment, a composite product includes hexagonal boron nitride (hBN), and a plurality of cubic boron nitride (cBN) particles, wherein the plurality of cBN particles are dispersed in a matrix of the hBN. According to another embodiment, a composite product includes a plurality of cBN particles, and one or more borate-containing binders.

  1. Boron Nitride Nanotubes

    NASA Technical Reports Server (NTRS)

    Smith, Michael W. (Inventor); Jordan, Kevin (Inventor); Park, Cheol (Inventor)

    2012-01-01

    Boron nitride nanotubes are prepared by a process which includes: (a) creating a source of boron vapor; (b) mixing the boron vapor with nitrogen gas so that a mixture of boron vapor and nitrogen gas is present at a nucleation site, which is a surface, the nitrogen gas being provided at a pressure elevated above atmospheric, e.g., from greater than about 2 atmospheres up to about 250 atmospheres; and (c) harvesting boron nitride nanotubes, which are formed at the nucleation site.

  2. Nanomechanical Characterization of Indium Nano/Microwires

    PubMed Central

    2010-01-01

    Nanomechanical properties of indium nanowires like structures fabricated on quartz substrate by trench template technique, measured using nanoindentation. The hardness and elastic modulus of wires were measured and compared with the values of indium thin film. Displacement burst observed while indenting the nanowire. ‘Wire-only hardness’ obtained using Korsunsky model from composite hardness. Nanowires have exhibited almost same modulus as indium thin film but considerable changes were observed in hardness value. PMID:20596474

  3. Abnormal Nitride Morphologies upon Nitriding Iron-Based Substrates

    NASA Astrophysics Data System (ADS)

    Meka, Sai Ramudu; Mittemeijer, Eric Jan

    2013-06-01

    Nitriding of iron-based components is a very well-known surface engineering method for bringing about great improvement of the mechanical and chemical properties. An overview is presented of the strikingly different nitride morphologies developing upon nitriding iron-based alloy substrates. Observed abnormal morphologies are the result of intricate interplay of the thermodynamic and kinetic constraints for the nucleation and growth of both alloying element nitride particles in the matrix and iron nitrides at the surface of the substrate. Alloying elements having strong Me-N interaction, such as Cr, V, and Ti, precipitate instantaneously as internal Me-nitrides, thus allowing the subsequent nucleation and growth of "normal" layer-type iron nitride. Alloying elements having weak Me-N interaction, such as Al, Si, and Mo, and simultaneously having low solubility in iron nitride, obstruct/delay the nucleation and growth of iron nitrides at the surface, thus leading to very high nitrogen supersaturation over an extended depth range from the surface. Eventually, the nucleation and growth of "abnormal" plate-type iron nitride occurs across the depth range of high nitrogen supersaturation. On this basis, strategies can be devised for tuned development of specific nitride morphologies at the surface of nitrided components.

  4. Boron nitride housing cools transistors

    NASA Technical Reports Server (NTRS)

    1965-01-01

    Boron nitride ceramic heat sink cools transistors in r-f transmitter and receiver circuits. Heat dissipated by the transistor is conducted by the boron nitride housing to the metal chassis on which it is mounted.

  5. Polarization effects in nitride and ferroelectric based devices

    NASA Astrophysics Data System (ADS)

    Singh, Madhusudan

    This dissertation addresses the application of theoretical and computational methods to examine heterostructure devices based on planar semiconductors. The thesis pursues III-V nitrides and ferroelectrics like LiNbO3 and BaxSr1-xTiO 3. GaN and other nitrides exhibit a large polarization charge arising from the built in polarization revealed in the [1000] growth direction, and are also wide band-gap materials (with the exception of InN). The nitrides are important for high-power/high-temperature electronics and for short wavelength light emitters. Our studies address important issues in large bandgap junctions, transistors and light emitters. One of the salient results of our studies has been the first calculations of tunnel current in polar junctions and the potential of using built in polar charge at interface to design junctions. We find that novel junctions cam be designed to produce tailorable I-V characteristics. Our studies have led to experimental realization of such tailorable junctions. We also present results on charge control in ferroelectric-nitride structures where post growth junction tailoring can be carried out (using poling) to create functional devices. This leads to a new class of devices such as switches. We have developed extensive charge control, Monte Carlo based transport models and device simulation techniques to examine nitride based transistors. These studies allow us to examine mobility, transit time, high frequency behavior, noise, transconductance, etc. We have examined device non-linearity issues, scaling issues, temperature dependence, noise sources, and device design optimization issues. Our results are closely coupled to experimental results. Role of unusual velocity-field relations, self-heating and non-equilibrium phonons is examined. III-V nitride based light emitters often exhibit a very high radiative efficiency, higher than the presence of dislocations in the system suggests. Calculations indicate however, that local disorder

  6. Anisotropy of the nitrogen conduction states in the group III nitrides studied by polarized x-ray absorption

    SciTech Connect

    Lawniczak-Jablonska, K. |; Liliental-Weber, Z.; Gullikson, E.M.

    1997-04-01

    Group III nitrides (AlN, GaN, and InN) consist of the semiconductors which appear recently as a basic materials for optoelectronic devices active in the visible/ultraviolet spectrum as well as high-temperature and high-power microelectronic devices. However, understanding of the basic physical properties leading to application is still not satisfactory. One of the reasons consists in unsufficient knowledge of the band structure of the considered semiconductors. Several theoretical studies of III-nitrides band structure have been published but relatively few experimental studies have been carried out, particularly with respect to their conduction band structure. This motivated the authors to examine the conduction band structure projected onto p-states of the nitrogen atoms for AlN, GaN and InN. An additional advantage of their studies is the availability of the studied nitrides in two structures, hexagonal (wurtzite) and cubic (zincblende). This offers an opportunity to gain information about the role of the anisotropy of electronic band states in determining various physical properties.

  7. MOVPE growth of InN films using 1,1-dimethylhydrazine as a nitrogen precursor

    NASA Astrophysics Data System (ADS)

    Thieu, Quang Tu; Seki, Yuki; Kuboya, Shigeyuki; Katayama, Ryuji; Onabe, Kentaro

    2009-05-01

    InN films have been successfully grown on sapphire substrates by MOVPE using trimethylindium (TMIn) and 1,1-dimethylhydrazine (DMHy) with N 2 carrier. DMHy is an advantageous precursor of N as it decomposes efficiently at relatively low temperature ( T50=420 °C) compatible with the InN growth. The reactor is specially designed so as to avoid parasitic reaction between TMIn and DMHy occurring at room temperature. The growth feature was studied by varying growth temperature, V/III ratio, TMIn flow and reactor pressure. The InN films were obtained at 500-570 °C and 60-200 Torr with a V/III ratio optimized to 100-200. The In droplets are seen on the grown surfaces, indicating an excess supply of TMIn. It is demonstrated that the InN films grows on the sapphire substrate in a single domain with an epitaxial relationship, [1 01¯ 0] InN//[1 1 2¯ 0] sapphire.

  8. III-Nitride ion implantation and device processing

    SciTech Connect

    Zolper, J.C.; Shul, R.J.; Baca, A.G.; Pearton, S.J.; Abernathy, C.R.; Wilson, R.G.; Stall, R.A.; Shur, M.

    1996-06-01

    Ion implantation doping and isolation has played a critical role in realizing high performance photonic and electronic devices in all mature semiconductor materials; this is also expected for binary III-Nitride materials (InN, GaN, AlN) and their alloys as epitaxy improves and more advanced device structures fabricated. This paper reports on recent progress in ion implantation doping of III-Nitride materials that has led to the first demonstration of a GaN JFET (junction field effect transistor). The JFET was fabricated with all ion implantation doping; in particular, p-type doping of GaN with Ca has been demonstrated with an estimated acceptor ionization energy of 169 meV. O-implantation has also been studied and shown to yield n-type conduction with an ionization energy of {similar_to}29 meV. Neither Ca or O display measurable redistribution during a 1125 C, 15 s activation anneal which sets an upper limit on their diffusivity at this temperature of 2.7{times}10{sup {minus}13}cm{sup 2}/s.

  9. Process for Patterning Indium for Bump Bonding

    NASA Technical Reports Server (NTRS)

    Denis, Kevin

    2012-01-01

    An innovation was created for the Cosmology Large Angular Scale Surveyor for integration of low-temperature detector chips with a silicon backshort and a silicon photonic choke through flipchip bonding. Indium bumps are typically patterned using liftoff processes, which require thick resist. In some applications, it is necessary to locate the bumps close to high-aspect-ratio structures such as wafer through-holes. In those cases, liftoff processes are challenging, and require complicated and time-consuming spray coating technology if the high-aspect-ratio structures are delineated prior to the indium bump process. Alternatively, processing the indium bumps first is limited by compatibility of the indium with subsequent processing. The present invention allows for locating bumps arbitrarily close to multiple-level high-aspect-ratio structures, and for indium bumps to be formed without liftoff resist. The process uses the poor step coverage of indium deposited on a silicon wafer that has been previously etched to delineate the location of the indium bumps. The silicon pattern can be processed through standard lithography prior to adding the high-aspect-ratio structures. Typically, high-aspectratio structures require a thick resist layer so this layer can easily cover the silicon topography. For multiple levels of topography, the silicon can be easily conformally coated through standard processes. A blanket layer of indium is then deposited onto the full wafer; bump bonding only occurs at the high points of the topography.

  10. EDITORIAL: Non-polar and semipolar nitride semiconductors Non-polar and semipolar nitride semiconductors

    NASA Astrophysics Data System (ADS)

    Han, Jung; Kneissl, Michael

    2012-02-01

    topics including growth and heteroepitaxy, bulk GaN substrates, theory and modelling, optical properties, laser diodes and LEDs as well as transport properties and electronics. Farrell et al review materials and growth issues for high-performance non- and semipolar light-emitting devices, and Scholz provides an overview of heteroepitaxial growth of semipolar GaN. Okada et al review growth mechanisms of non- and semipolar GaN layers on patterned sapphire substrates, and Vennéguès discusses defect reduction methods for heteroepitaxially grown non- and semipolar III-nitride films. Leung et al explain how kinetic Wulff plots can be used to design and control non-polar and semipolar GaN heteroepitaxy, and a contribution by Sawaki et al explores the impurity incorporation in (1-101) GaN grown on Si substrates. In the area of bulk crystal growth Kucharski et al review non- and semipolar GaN substrates by ammonothermal growth, and Chichibu et al discuss the challenges for epitaxial growth of InGaN on free-standing m-plane GaN substrates. Calculation of semipolar orientations for wurtzitic semiconductor heterostructures and their application to nitrides and oxides are reviewed by Bigenwald et al, and Ito et al present an ab initio approach to reconstruction, adsorption, and incorporation on GaN surfaces. Finally, the theoretical description of non-polar and semipolar nitride semiconductor quantum-well structures is presented by Ahn et al. In a discussion of the optical properties, Kisin et al discuss the effect of the quantum well population on the optical characteristics of polar, semipolar and non-polar III-nitride light emitters, and Jönen et al investigate the indium incorporation and optical properties of non- and semipolar GaInN QW structures. Wernicke et al explore the emission wavelength of polar, non-polar, and semipolar InGaN quantum wells and the incorporation of indium. In a contribution by Melo et al, the gain in polar and non-polar/semipolar gallium-nitride

  11. Nitride quantum light sources

    NASA Astrophysics Data System (ADS)

    Zhu, T.; Oliver, R. A.

    2016-02-01

    Prototype nitride quantum light sources, particularly single-photon emitters, have been successfully demonstrated, despite the challenges inherent in this complex materials system. The large band offsets available between different nitride alloys have allowed device operation at easily accessible temperatures. A wide range of approaches has been explored: not only self-assembled quantum dot growth but also lithographic methods for site-controlled nanostructure formation. All these approaches face common challenges, particularly strong background signals which contaminate the single-photon stream and excessive spectral diffusion of the quantum dot emission wavelength. If these challenges can be successfully overcome, then ongoing rapid progress in the conventional III-V semiconductors provides a roadmap for future progress in the nitrides.

  12. Spectral dependence of third-order nonlinear optical properties in InN

    SciTech Connect

    Ahn, H. Lee, M.-T.; Chang, Y.-M.

    2014-05-19

    We report on the nonlinear optical properties of InN measured in a wide near-infrared spectral range with the femtosecond Z-scan technique. The above-bandgap nonlinear absorption in InN is found to originate from the saturation of absorption by the band-state-filling and its cross-section increases drastically near the bandgap energy. With below-bandgap excitation, the nonlinear absorption undergoes a transition from saturation absorption (SA) to reverse-SA (RSA), attributed to the competition between SA of band-tail states and two-photon-related RSA. The measured large nonlinear refractive index of the order of 10{sup −10} cm{sup 2}/W indicates InN as a potential material for all-optical switching and related applications.

  13. Fe-doped InN layers grown by molecular beam epitaxy

    SciTech Connect

    Wang Xinqiang; Liu Shitao; Ma Dingyu; Zheng Xiantong; Chen Guang; Xu Fujun; Tang Ning; Shen Bo; Zhang Peng; Cao Xingzhong; Wang Baoyi; Huang Sen; Chen, Kevin J.; Zhou Shengqiang; Yoshikawa, Akihiko

    2012-10-22

    Iron(Fe)-doped InN (InN:Fe) layers have been grown by molecular beam epitaxy. It is found that Fe-doping leads to drastic increase of residual electron concentration, which is different from the semi-insulating property of Fe-doped GaN. However, this heavy n-type doping cannot be fully explained by doped Fe-concentration ([Fe]). Further analysis shows that more unintentionally doped impurities such as hydrogen and oxygen are incorporated with increasing [Fe] and the surface is degraded with high density pits, which probably are the main reasons for electron generation and mobility reduction. Photoluminescence of InN is gradually quenched by Fe-doping. This work shows that Fe-doping is one of good choices to control electron density in InN.

  14. High mobility InN epilayers grown on AlN epilayer templates

    NASA Astrophysics Data System (ADS)

    Khan, N.; Sedhain, A.; Li, J.; Lin, J. Y.; Jiang, H. X.

    2008-04-01

    We report on the growth of InN epilayers on AlN/sapphire templates by metal organic chemical vapor deposition. Compared to InN epilayers grown on GaN templates, significant improvements in the electrical and optical properties of InN epilayers on AlN templates were observed. An increase in electron mobility, a decrease in background electron concentration, and a redshift of photoluminescence emission peak position with increasing the growth temperature and V/III ratio were observed and a room temperature Hall mobility of 1400cm2/Vs with a free electron concentration of about 7×1018cm-3 was obtained. The improvements were partly attributed to the use of AlN templates, which allows for higher growth temperatures leading to an enhanced supply of nitrogen atoms and a possible reduction in the incorporation of unintentional impurities and nitrogen vacancy related defects.

  15. Spectral dependence of third-order nonlinear optical properties in InN

    NASA Astrophysics Data System (ADS)

    Ahn, H.; Lee, M.-T.; Chang, Y.-M.

    2014-05-01

    We report on the nonlinear optical properties of InN measured in a wide near-infrared spectral range with the femtosecond Z-scan technique. The above-bandgap nonlinear absorption in InN is found to originate from the saturation of absorption by the band-state-filling and its cross-section increases drastically near the bandgap energy. With below-bandgap excitation, the nonlinear absorption undergoes a transition from saturation absorption (SA) to reverse-SA (RSA), attributed to the competition between SA of band-tail states and two-photon-related RSA. The measured large nonlinear refractive index of the order of 10-10 cm2/W indicates InN as a potential material for all-optical switching and related applications.

  16. Terahertz detectors arrays based on orderly aligned InN nanowires

    PubMed Central

    Chen, Xuechen; Liu, Huiqiang; Li, Qiuguo; Chen, Hao; Peng, Rufang; Chu, Sheng; Cheng, Binbin

    2015-01-01

    Nanostructured terahertz detectors employing a single semiconducting nanowire or graphene sheet have recently generated considerable interest as an alternative to existing THz technologies, for their merit on the ease of fabrication and above-room-temperature operation. However, the lack of alignment in nanostructure device hindered their potential toward practical applications. The present work reports ordered terahertz detectors arrays based on neatly aligned InN nanowires. The InN nanostructures (nanowires and nano-necklaces) were achieved by chemical vapor deposition growth, and then InN nanowires were successfully transferred and aligned into micrometer-sized groups by a “transfer-printing” method. Field effect transistors on aligned nanowires were fabricated and tested for terahertz detection purpose. The detector showed good photoresponse as well as low noise level. Besides, dense arrays of such detectors were also fabricated, which rendered a peak responsivity of 1.1 V/W from 7 detectors connected in series. PMID:26289498

  17. Nitrided Metallic Bipolar Plates

    SciTech Connect

    Brady, Michael P; Tortorelli, Peter F; Pihl, Josh A; Toops, Todd J; More, Karren Leslie; Meyer III, Harry M; Vitek, John Michael; Wang, Heli; Turner, John; Wilson, Mahlon; Garzon, Fernando; Rockward, Tommy; Connors, Dan; Rakowski, Jim; Gervasio, Don

    2008-01-01

    The objectives are: (1) Develop and optimize stainless steel alloys amenable to formation of a protective Cr-nitride surface by gas nitridation, at a sufficiently low cost to meet DOE targets and with sufficient ductility to permit manufacture by stamping. (2) Demonstrate capability of nitridation to yield high-quality stainless steel bipolar plates from thin stamped alloy foils (no significant stamped foil warping or embrittlement). (3) Demonstrate single-cell fuel cell performance of stamped and nitrided alloy foils equivalent to that of machined graphite plates of the same flow-field design ({approx}750-1,000 h, cyclic conditions, to include quantification of metal ion contamination of the membrane electrode assembly [MEA] and contact resistance increase attributable to the bipolar plates). (4) Demonstrate potential for adoption in automotive fuel cell stacks. Thin stamped metallic bipolar plates offer the potential for (1) significantly lower cost than currently-used machined graphite bipolar plates, (2) reduced weight/volume, and (3) better performance and amenability to high volume manufacture than developmental polymer/carbon fiber and graphite composite bipolar plates. However, most metals exhibit inadequate corrosion resistance in proton exchange membrane fuel cell (PEMFC) environments. This behavior leads to high electrical resistance due to the formation of surface oxides and/or contamination of the MEA by metallic ions, both of which can significantly degrade fuel cell performance. Metal nitrides offer electrical conductivities up to an order of magnitude greater than that of graphite and are highly corrosion resistant. Unfortunately, most conventional coating methods (for metal nitrides) are too expensive for PEMFC stack commercialization or tend to leave pinhole defects, which result in accelerated local corrosion and unacceptable performance.

  18. Cubic nitride templates

    DOEpatents

    Burrell, Anthony K; McCleskey, Thomas Mark; Jia, Quanxi; Mueller, Alexander H; Luo, Hongmei

    2013-04-30

    A polymer-assisted deposition process for deposition of epitaxial cubic metal nitride films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures under a suitable atmosphere to yield metal nitride films and the like. Such films can be used as templates for the development of high quality cubic GaN based electronic devices.

  19. Hydrogen adsorbed at N-polar InN: Significant changes in the surface electronic properties

    NASA Astrophysics Data System (ADS)

    Eisenhardt, A.; Krischok, S.; Himmerlich, M.

    2015-06-01

    The interaction of atomic hydrogen and ammonia with as-grown N-polar InN surfaces is investigated using in situ photoelectron spectroscopy. Changes in the surface electronic properties, including the band alignment and work function, as well as the chemical bonding states of the substrate and adsorbates are characterized. Ammonia molecules are dissociating at the InN surface, resulting in adsorption of hydrogen species. Consequently, the considerable changes of the chemical and electronic properties of the InN surface during ammonia interaction are almost identical to those found for adsorption of atomic hydrogen. In both cases, hydrogen atoms preferentially bond to surface nitrogen atoms, resulting in the disappearance of the nitrogen dangling-bond-related occupied surface state close to the valence band edge at ˜1.6 eV binding energy and the formation of new occupied electron states at the conduction band edge. Furthermore, a decrease in work function during adsorption from 4.7 to 3.7-3.8 eV, as well as an increase in the surface downward band bending by 0.3 eV, confirm that hydrogen is acting as electron donor at InN surfaces and therefore has to be considered as one main reason for the surface electron accumulation observed at N-polar InN samples exposed to ambient conditions, for example as the dissociation product of molecules. The measured formation and occupation of electronic states above the conduction band minimum occur in conjunction with the observed increase in surface electron concentration and underline the relationship between the energy position of occupied electron states and surface band alignment for InN as a small-band-gap semiconductor.

  20. Microstructures of InN film on 4H-SiC (0001) substrate grown by RF-MBE

    NASA Astrophysics Data System (ADS)

    Jantawongrit, P.; Sanorpim, S.; Yaguchi, H.; Orihara, M.; Limsuwan, P.

    2015-08-01

    InN film was grown on 4H-SiC (0001) substrate by RF plasma-assisted molecular beam epitaxy (RF-MBE). Prior to the growth of InN film, an InN buffer layer with a thickness of ∼5.5 nm was grown on the substrate. Surface morphology, microstructure and structural quality of InN film were investigated. Micro-structural defects, such as stacking faults and anti-phase domain in InN film were carefully investigated using transmission electron microscopy (TEM). The results show that a high density of line contrasts, parallel to the growth direction (c-axis), was clearly observed in the grown InN film. Dark field TEM images recorded with diffraction vectors g=11\\bar{2}0 and g = 0002 revealed that such line contrasts evolved from a coalescence of the adjacent misoriented islands during the initial stage of the InN nucleation on the substrate surface. This InN nucleation also led to a generation of anti-phase domains. Project supported by the Thailand Center of Excellence in Physics (ThEP) and the King Mongkut's University of Technology Thonburi under The National Research University Project. One of the authors (S. Sanorpim) was supported by the National Research Council of Thailand (NRCT) and the Thai Government Stimulus Package 2 (TKK2555), under the Project for Establishment of Comprehensive Center for Innovative Food, Health Products and Agriculture.

  1. Electrical and optical properties of p-type InN

    SciTech Connect

    Mayer, Marie A.; Choi, Soojeong; Bierwagen, Oliver; Smith, Holland M.; Haller, Eugene E.; Speck, James S.; Walukiewicz, Wladek

    2011-01-01

    We have performed comprehensive studies of optical, thermoelectric and electrical properties of Mg doped InN with varying Mg doping levels and sample thicknesses. Room temperature photoluminescence spectra show a Mg acceptor related emission and the thermopower provides clear evidence for the presence of mobile holes. Although the effects of the hole transport are clearly observed in the temperature dependent electrical properties, the sign of the apparent Hall coefficient remains negative in all samples. We show that the standard model of two electrically well connected layers (n-type surface electron accumulation and p-type bulk) does not properly describe Hall effect in p-type InN.

  2. Two-dimensional electron gas in monolayer InN quantum wells

    DOE PAGESBeta

    Pan, Wei; Dimakis, Emmanouil; Wang, George T.; Moustakas, Theodore D.; Tsui, Daniel C.

    2014-11-24

    We report in this letter experimental results that confirm the two-dimensional nature of the electron systems in monolayer InN quantum wells embedded in GaN barriers. The electron density and mobility of the two-dimensional electron system (2DES) in these InN quantum wells are 5×1015 cm-2 and 420 cm2 /Vs, respectively. Moreover, the diagonal resistance of the 2DES shows virtually no temperature dependence in a wide temperature range, indicating the topological nature of the 2DES.

  3. Electrical and electrothermal transport in InN: The roles of defects

    NASA Astrophysics Data System (ADS)

    Miller, N.; Ager, J. W.; Jones, R. E.; Smith, H. M.; Mayer, M. A.; Yu, K. M.; Hawkridge, M. E.; Liliental-Weber, Z.; Haller, E. E.; Walukiewicz, W.; Schaff, W. J.; Gallinat, C.; Koblmüller, G.; Speck, J. S.

    2009-12-01

    The transport properties of Mg doped and undoped InN films are studied with capacitance-voltage, thermopower, and Hall mobility measurements. A positive Seebeck coefficient is observed for Mg doped InN confirming p-type conductivity, though high doping and structural defect density can lead to n-type films. Transport measurements of undoped films are analyzed employing Rode's iterative Boltzmann equation method. Observed thermopower, Hall mobility, and dislocation density data for undoped films are consistent with calculations including the effects of charged line defect (donor-type dislocation) scattering.

  4. Two-dimensional electron gas in monolayer InN quantum wells

    SciTech Connect

    Pan, Wei; Dimakis, Emmanouil; Wang, George T.; Moustakas, Theodore D.; Tsui, Daniel C.

    2014-11-24

    We report in this letter experimental results that confirm the two-dimensional nature of the electron systems in monolayer InN quantum wells embedded in GaN barriers. The electron density and mobility of the two-dimensional electron system (2DES) in these InN quantum wells are 5×1015 cm-2 and 420 cm2 /Vs, respectively. Moreover, the diagonal resistance of the 2DES shows virtually no temperature dependence in a wide temperature range, indicating the topological nature of the 2DES.

  5. Surface states and electronic structure of polar and nonpolar InN - An in situ photoelectron spectroscopy study

    SciTech Connect

    Eisenhardt, A.; Krischok, S.; Himmerlich, M.

    2013-06-10

    Valence band structure and surface states of InN with (0001), (000-1), (1-100), and (11-20) orientation were investigated in situ after growth using photoelectron spectroscopy. Depending on surface orientation, different occupied surface states are identified and differentiated from bulk contributions. For N-polar, m-plane, and a-plane InN, the surface states are located at the valence band maximum, while In-polar InN features surface states close to the Fermi level. The surface band alignment correlates with the position of surface states. For InN(0001), a much larger surface downward band bending is observed compared to N-polar, m-plane, and a-plane InN, where almost flat band conditions occur.

  6. A Kinetic Study of Indium Leaching from Indium-Bearing Zinc Ferrite Under Microwave Heating

    NASA Astrophysics Data System (ADS)

    Zhang, Linye; Mo, Jiamei; Li, Xuanhai; Pan, Liuping; Liang, Xinyuan; Wei, Guangtao

    2013-12-01

    To obtain information about leaching reaction and kinetics of indium from indium-bearing materials under microwave heating (MH), leaching of indium from indium-bearing zinc ferrite (IBZF) has been investigated. IBZF samples under MH and under conventional heating (CH) were studied by X-ray diffraction and specific surface area. Compared with that of CH, the effect of MH and the effects of various control parameters on indium leaching were studied. The results showed that compared with CH, MH enhanced the indium leaching from IBZF and increased the leaching rate. The leaching behavior of indium from IBZF was analyzed by unreacted shrinking core model, and the regression of kinetic equations showed that leaching of indium from IBZF obeyed the model very well. The activation energies under MH and under CH were 77.374 kJ/mol and 53.555 kJ/mol, respectively; the ratio of frequency factor K 0(MH)/ K 0(CH) was 10,818.36. The activation mechanism involved in leaching of indium under MH was mainly the increase of reactant energy and effective collision, which caused by the thermal and nonthermal microwave effect. Compared with the activation energy, the effective collision played a more important role in the acceleration of leaching of indium.

  7. Morphology and composition controlled growth of polar c-axis and nonpolar m-axis well-aligned ternary III-nitride nanotube arrays.

    PubMed

    Li, Huijie; Zhao, Guijuan; Kong, Susu; Han, Dongyue; Wei, Hongyuan; Wang, Lianshan; Chen, Zhen; Yang, Shaoyan

    2015-10-21

    Control over the nanostructure morphology and growth orientation is in high demand for fundamental research and technological applications. Herein we report a general strategy to fabricate polar c-axis and nonpolar m-axis well-aligned III-nitride ternary nanotube arrays with controllable morphologies and compositions. By depositing AlN on the InN nanorod array templates and thermally removing the InN templates, InAlN nanotubes can be obtained. Polar c-axis and nonpolar m-axis nanotubes were formed on the c- and r-plane sapphire substrates, respectively. The nanotubes are single crystalline and highly ordered on the substrates, as revealed by X-ray diffraction, electron microscopy, and selected area electron microscopy characterization. It was found that the In droplets on top of the InN nanorods play a critical role in controlling the morphology of the nanotubes. By keeping or removing the In droplets, the obtained nanotubes exhibited both ends open or only one end open. And by varying the AlN deposition temperature, the In composition in the nanotubes can be changed from 0 to 0.29. The nanotube synthesis method is simple and can be applied to the formation of other III-nitride ternary (InGaN, and AlGaN) or quaternary (InAlGaN) alloy nanotube arrays. PMID:26395389

  8. Sintering silicon nitride

    NASA Technical Reports Server (NTRS)

    Bansal, Narottam P. (Inventor); Levine, Stanley R. (Inventor); Sanders, William A. (Inventor)

    1993-01-01

    Oxides having a composition of (Ba(1-x)Sr(x))O-Al2O3-2SiO2 are used as sintering aids for producing an improved silicon nitride ceramic material. The x must be greater than 0 to insure the formation of the stable monoclinic celsian glass phase.

  9. Indium Phosphide Window Layers for Indium Gallium Arsenide Solar Cells

    NASA Technical Reports Server (NTRS)

    Jain, Raj K.

    2005-01-01

    Window layers help in reducing the surface recombination at the emitter surface of the solar cells resulting in significant improvement in energy conversion efficiency. Indium gallium arsenide (In(x)Ga(1-x)As) and related materials based solar cells are quite promising for photovoltaic and thermophotovoltaic applications. The flexibility of the change in the bandgap energy and the growth of InGaAs on different substrates make this material very attractive for multi-bandgap energy, multi-junction solar cell approaches. The high efficiency and better radiation performance of the solar cell structures based on InGaAs make them suitable for space power applications. This work investigates the suitability of indium phosphide (InP) window layers for lattice-matched In(0.53)Ga(0.47)As (bandgap energy 0.74 eV) solar cells. We present the first data on the effects of the p-type InP window layer on p-on-n lattice-matched InGaAs solar cells. The modeled quantum efficiency results show a significant improvement in the blue region with the InP window. The bare InGaAs solar cell performance suffers due to high surface recombination velocity (10(exp 7) cm/s). The large band discontinuity at the InP/InGaAs heterojunction offers a great potential barrier to minority carriers. The calculated results demonstrate that the InP window layer effectively passivates the solar cell front surface, hence resulting in reduced surface recombination and therefore, significantly improving the performance of the InGaAs solar cell.

  10. Indium tin oxide nanowires grown by one-step thermal evaporation-deposition process at low temperature.

    PubMed

    Dong, Haibo; Zhang, Xiaoxian; Niu, Zhiqiang; Zhao, Duan; Li, Jinzhu; Cai, Le; Zhou, Weiya; Xie, Sishen

    2013-02-01

    Indium tin oxide (ITO), as one of the most important transparent conducting oxide, is widely used in electro-optical field. We have developed a simple one-step method to synthesize ITO nanowires at low temperature of 600 degrees C. In detail, mixtures of InN nanowires and SnO powder, with the molar ratio of 10:1, have been used as precursors for the thermal evaporation-deposition of ITO nanowires on silicon/quartz slices. During the growth process, the evaporation temperature is maintained at 600 degrees C, which favors the decomposition of InN and oxidation of In, with a limited incorporation of Sn in the resulting compound (In:Sn approximately 11:1 in atomic ratio). As far as we know, this is the lowest growth temperature reported on the thermal deposition of ITO nanowires. The diameters of the nanowires are about 120 nm and the lengths are up to tens of micrometers. XRD characterization indicates the high crystallization of the nanowires. HRTEM results show the nanowires grow along the [200] direction. The transmittance of the nanowire film on quartz slice is more than 75% in the visible region. Based on photolithography and lift-off techniques, four-terminal measurement was utilized to test the resistivity of individual nanowire (6.11 x 10(-4) omega x cm). The high crystallization quality, good transmittance and low resistivity make as-grown ITO nanowires a promising candidate as transparent electrodes of nanoscale devices. PMID:23646624

  11. Self-assembled InN micro-mushrooms by upside-down pendeoepitaxy

    NASA Astrophysics Data System (ADS)

    Sarwar, A. T. M. Golam; Yang, Fan; Esser, Bryan D.; Kent, Thomas F.; McComb, David W.; Myers, Roberto C.

    2016-06-01

    Self-assembly of hexagonal InN micro-mushrooms on Si (111) substrates by molecular beam epitaxy is reported. Scanning electron microscopy (SEM) reveals hexagonal mushroom caps with smooth top surfaces and a step-like morphology at the bottom surface. A detailed growth study along with SEM measurements reveals that an upside-down pendeoepitaxy mechanism underlies the formation of these structures. Cryogenic temperature photoluminescence measurements on the InN disks show a dominant band-to-acceptor recombination peak at 0.68 eV. Cross-section annular bright field (ABF-) scanning transmission electron microscopy (STEM) reveals that the growth of these structures occurs along the [ 000 1 bar ] crystallographic orientation (N-face). Plan-view high angle annular dark field (HAADF) STEM in the center of the micro-disks reveals a hexagonal lattice indicative of stacking faults. However, at the outskirt of the micro-disk, surprisingly, a honeycomb lattice is observed in plan view STEM indicating a perfect freestanding Wurtzite InN disk that is free of stacking faults. This result opens a pathway for realizing strain-free, freestanding InN substrates.

  12. Golf Tournament Drives in a Win for the Children’s Inn | Poster

    Cancer.gov

    By Carolynne Keenan, Contributing Writer On September 23, golfers took to the Clustered Spires golf course in Frederick, Md., for a cause. The R&W Club Frederick hosted its inaugural golf tournament, with proceeds benefiting the National Institutes of Health (NIH) Children’s Inn.

  13. Dopants and Defects in InN and InGaN Alloys

    SciTech Connect

    Walukiewicz, W.; Jones, R.E.; Li, S.X.; Yu, K.M.; Ager III, J.W.; Haller, E.E.; Lu, H.; Schaff, W.J.

    2005-04-01

    We have performed systematic studies of the effects of high-energy particle irradiation on the properties of InGaN alloys. In agreement with the amphoteric defect model, irradiation of InN produces donor-like defects. The electron concentration increases with increasing radiation dose and saturates at 4 x 10{sup 20} cm{sup -3} at very high doses. We find that the increase of the electron concentration causes a large blue-shift of the absorption edge, which is well-explained by the Burstein-Moss effect. The maximum electron concentration decreases with increasing Ga fraction in irradiated In{sub 1-x}Ga{sub x}N alloys as the conduction band edge approaches the Fermi level stabilization energy (E{sub FS}). For x > 0.66 the conduction band edge moves above E{sub FS} and the irradiation of n-type films produces acceptor-like defects, resulting in a reduced free electron concentration. An analysis of the concentration dependence of the electron mobility in InN indicates that the dominant defects in irradiated InN are triply-charged donors. Finally, we show that InN films doped with Mg acceptors behave like undoped films above a threshold radiation dose.

  14. EDITORIAL: Non-polar and semipolar nitride semiconductors Non-polar and semipolar nitride semiconductors

    NASA Astrophysics Data System (ADS)

    Han, Jung; Kneissl, Michael

    2012-02-01

    topics including growth and heteroepitaxy, bulk GaN substrates, theory and modelling, optical properties, laser diodes and LEDs as well as transport properties and electronics. Farrell et al review materials and growth issues for high-performance non- and semipolar light-emitting devices, and Scholz provides an overview of heteroepitaxial growth of semipolar GaN. Okada et al review growth mechanisms of non- and semipolar GaN layers on patterned sapphire substrates, and Vennéguès discusses defect reduction methods for heteroepitaxially grown non- and semipolar III-nitride films. Leung et al explain how kinetic Wulff plots can be used to design and control non-polar and semipolar GaN heteroepitaxy, and a contribution by Sawaki et al explores the impurity incorporation in (1-101) GaN grown on Si substrates. In the area of bulk crystal growth Kucharski et al review non- and semipolar GaN substrates by ammonothermal growth, and Chichibu et al discuss the challenges for epitaxial growth of InGaN on free-standing m-plane GaN substrates. Calculation of semipolar orientations for wurtzitic semiconductor heterostructures and their application to nitrides and oxides are reviewed by Bigenwald et al, and Ito et al present an ab initio approach to reconstruction, adsorption, and incorporation on GaN surfaces. Finally, the theoretical description of non-polar and semipolar nitride semiconductor quantum-well structures is presented by Ahn et al. In a discussion of the optical properties, Kisin et al discuss the effect of the quantum well population on the optical characteristics of polar, semipolar and non-polar III-nitride light emitters, and Jönen et al investigate the indium incorporation and optical properties of non- and semipolar GaInN QW structures. Wernicke et al explore the emission wavelength of polar, non-polar, and semipolar InGaN quantum wells and the incorporation of indium. In a contribution by Melo et al, the gain in polar and non-polar/semipolar gallium-nitride

  15. Nanostructural and electronic properties of polytypes in InN nanocolumns

    SciTech Connect

    Kioseoglou, J.; Koukoula, T.; Komninou, Ph.; Kehagias, Th.; Georgakilas, A.; Androulidaki, M.

    2013-08-21

    Transmission electron microscopy techniques and density functional theory calculations were employed to investigate the nanostructural and electronic properties of InN polytypes observed in InN nanocolumns, grown on Si(111) by molecular beam epitaxy. Moiré fringes and alternating hexagonal and cubic lattice stacking sequences along the c-axis, observed among the wurtzite layers, implied the presence of different structures embedded in the basic 2H structure of the nanocolumns. Quantitative electron diffraction analysis and high-resolution image simulations verified the coexistence of the wurtzite structure with the 4H, 6H, and the 3C zinc-blende structural polytypes. Total energies calculations established the 2H wurtzite structure as the most stable polytype. The band gap of all polytypes was found direct with the energies and the band gaps of the 4H (E{sub g} = 0.64 eV) and 6H (E{sub g} = 0.60 eV) structures calculated between the corresponding values of the 2H (E{sub g} = 0.75 eV) and 3C (E{sub g} = 0.49 eV) basic structures. Theoretical and experimental analysis showed that at the initial stages of growth InN nanocolumns were under tensile strain along both the basal plane and growth direction. Structural polytypes were then introduced in the form of embedded inclusions to accommodate the excess tensile strain along the growth direction, allowing the entire process of polymorphism to be the dominant strain relaxation mechanism of InN nanocolumns. Moreover, the lattice and energetic properties and band gap values of InN polytypes showed a linear dependence on hexagonality, while the presence of polytypes led to a characteristic broadening of the photoluminescence emission peak toward lower emission energies.

  16. Large-scale cubic InN nanocrystals by a combined solution- and vapor-phase method under silica confinement.

    PubMed

    Chen, Zhuo; Li, Yanan; Cao, Chuanbao; Zhao, Songrui; Fathololoumi, Saeed; Mi, Zetian; Xu, Xingyan

    2012-01-18

    Large-scale cubic InN nanocrystals were synthesized by a combined solution- and vapor-phase method under silica confinement. Nearly monodisperse cubic InN nanocrystals with uniform spherical shape were dispersed stably in various organic solvents after removal of the silica shells. The average size of InN nanocrystals is 5.7 ± 0.6 nm. Powder X-ray diffraction results indicate that the InN nanocrystals are of high crystallinity with a cubic phase. X-ray photoelectron spectroscopy and energy-dispersive spectroscopy confirm that the nanocrystals are composed of In and N elements. The InN nanocrystals exhibit infrared photoluminescence at room temperature, with a peak energy of ~0.62 eV, which is smaller than that of high-quality wurtzite InN (~0.65-0.7 eV) and is in agreement with theoretical calculations. The small emission peak energy of InN nanocrystals, as compared to other low-cost solution or vapor methods, reveals the superior crystalline quality of our samples, with low or negligible defect density. This work will significantly promote InN-based applications in IR optoelectronic device and biology. PMID:22224725

  17. Analysis of plasma nitrided steels

    NASA Technical Reports Server (NTRS)

    Salik, J.; Ferrante, J.; Honecy, F.; Hoffman, R., Jr.

    1987-01-01

    The analysis of plasma nitrided steels can be divided to two main categories - structural and chemical. Structural analysis can provide information not only on the hardening mechanisms but also on the fundamental processes involved. Chemical analysis can be used to study the kinetics for the nitriding process and its mechanisms. In this paper preliminary results obtained by several techniques of both categories are presented and the applicability of those techniques to the analysis of plasma-nitrided steels is discussed.

  18. Mineral resource of the month: indium

    USGS Publications Warehouse

    Tolcin, Amy C.

    2011-01-01

    Geologically, the occurrence of indium minerals is rare. The element most often occurs as a sulfide inclusion or substitutes in other base-metal minerals, including cassiterite, chalcopyrite, sphalerite and stannite. Indium’s abundance in the crust is estimated to be 0.05 parts per million, which makes it more abundant than silver, but it is so widely disseminated that it does not occur in high enough concentrations to form mineable deposits. Therefore, indium is most often recovered from byproduct residues produced during the refining of lead and zinc. But only about one-quarter of the indium mined worldwide is refined into metal, as many indium-bearing concentrates are sent to refineries that do not have the capability of recovering the metal.

  19. Indium Single-Ion Frequency Standard

    NASA Technical Reports Server (NTRS)

    Nagourney, Warren

    2001-01-01

    A single laser-cooled indium ion is a promising candidate for an ultimate resolution optical time or frequency standard. It can be shown that single ions from group IIIA of the periodic table (indium, thallium, etc.) can have extremely small systematic errors. In addition to being free from Doppler, transit-time and collisional shifts, these ions are also quite insensitive to perturbations from ambient magnetic and electric fields (mainly due to the use of a J=0-0 transition for spectroscopy). Of all group IIIA ions, indium seems to be the most practical, since it is heavy enough to have a tolerable intercombination cooling transition rate and (unlike thallium) has transitions which are easily accessible with frequency multiplied continuous-wave lasers. A single indium ion standard has a potential inaccuracy of one part in 10(exp 18) for integration times of 10(exp 6) seconds. We have made substantial progress during the grant period in constructing a frequency standard based upon a single indium ion. At the beginning of the grant period, single indium ions were being successfully trapped, but the lasers and optical systems were inadequate to achieve the desired goal. We have considerably improved the stability of the dye laser used to cool the ions and locked it to a molecular resonance line, making it possible to observe stable cooling-line fluorescence from a single indium ion for reasonable periods of time, as required by the demands of precision spectroscopy. We have substantially improved the single-ion fluorescence signal with significant benefits for the detection efficiency of forbidden transitions using the 'shelving' technique. Finally, we have constructed a compact, efficient UV 'clock' laser and observed 'clock' transitions in single indium ions using this laser system. We will elaborate on these accomplishments.

  20. Quantification of indium in steel using PIXE

    NASA Astrophysics Data System (ADS)

    Oliver, A.; Miranda, J.; Rickards, J.; Cheang, J. C.

    1989-04-01

    The quantitative analysis of steel for endodontics tools was carried out using low-energy protons (≤ 700 keV). A computer program for a thick-target analysis which includes enhancement due to secondary fluorescence was used. In this experiment the L-lines of indium are enhanced due to the proximity of other elements' K-lines to the indium absorption edge. The results show that the ionization cross section expression employed to evaluate this magnitude is important.

  1. Superplastic forging nitride ceramics

    DOEpatents

    Panda, Prakash C.; Seydel, Edgar R.; Raj, Rishi

    1988-03-22

    The invention relates to producing relatively flaw free silicon nitride ceramic shapes requiring little or no machining by superplastic forging This invention herein was made in part under Department of Energy Grant DE-AC01-84ER80167, creating certain rights in the United States Government. The invention was also made in part under New York State Science and Technology Grant SB1R 1985-10.

  2. Electrically injected near-infrared light emission from single InN nanowire p-i-n diode

    SciTech Connect

    Le, Binh Huy; Zhao, Songrui; Tran, Nhung Hong; Mi, Zetian

    2014-12-08

    We report on the achievement of electroluminescence emission of single InN p-i-n nanowire devices. InN p-i-n nanowire structures were grown directly on Si substrate by plasma-assisted molecular beam epitaxy and subsequently transferred to foreign substrate for the fabrication of single nanowire light emitting diodes. Electroluminescence emission with a peak energy of 0.71 eV (1.75 μm) was observed at 77 K. The measurement of near-bandgap electroluminescence provides unambiguous evidence for the achievement of p-type conduction of InN.

  3. Electrically injected near-infrared light emission from single InN nanowire p-i-n diode

    NASA Astrophysics Data System (ADS)

    Le, Binh Huy; Zhao, Songrui; Tran, Nhung Hong; Mi, Zetian

    2014-12-01

    We report on the achievement of electroluminescence emission of single InN p-i-n nanowire devices. InN p-i-n nanowire structures were grown directly on Si substrate by plasma-assisted molecular beam epitaxy and subsequently transferred to foreign substrate for the fabrication of single nanowire light emitting diodes. Electroluminescence emission with a peak energy of 0.71 eV (1.75 μm) was observed at 77 K. The measurement of near-bandgap electroluminescence provides unambiguous evidence for the achievement of p-type conduction of InN.

  4. Gallium nitride electronics

    NASA Astrophysics Data System (ADS)

    Rajan, Siddharth; Jena, Debdeep

    2013-07-01

    In the past two decades, there has been increasing research and industrial activity in the area of gallium nitride (GaN) electronics, stimulated first by the successful demonstration of GaN LEDs. While the promise of wide band gap semiconductors for power electronics was recognized many years before this by one of the contributors to this issue (J Baliga), the success in the area of LEDs acted as a catalyst. It set the field of GaN electronics in motion, and today the technology is improving the performance of several applications including RF cell phone base stations and military radar. GaN could also play a very important role in reducing worldwide energy consumption by enabling high efficiency compact power converters operating at high voltages and lower frequencies. While GaN electronics is a rapidly evolving area with active research worldwide, this special issue provides an opportunity to capture some of the great advances that have been made in the last 15 years. The issue begins with a section on epitaxy and processing, followed by an overview of high-frequency HEMTs, which have been the most commercially successful application of III-nitride electronics to date. This is followed by review and research articles on power-switching transistors, which are currently of great interest to the III-nitride community. A section of this issue is devoted to the reliability of III-nitride devices, an area that is of increasing significance as the research focus has moved from not just high performance but also production-worthiness and long-term usage of these devices. Finally, a group of papers on new and relatively less studied ideas for III-nitride electronics, such as interband tunneling, heterojunction bipolar transistors, and high-temperature electronics is included. These areas point to new areas of research and technological innovation going beyond the state of the art into the future. We hope that the breadth and quality of articles in this issue will make it

  5. Powder-XRD and (14) N magic angle-spinning solid-state NMR spectroscopy of some metal nitrides.

    PubMed

    Kempgens, Pierre; Britton, Jonathan

    2016-05-01

    Some metal nitrides (TiN, ZrN, InN, GaN, Ca3 N2 , Mg3 N2 , and Ge3 N4 ) have been studied by powder X-ray diffraction (XRD) and (14) N magic angle-spinning (MAS) solid-state NMR spectroscopy. For Ca3 N2 , Mg3 N2 , and Ge3 N4 , no (14) N NMR signal was observed. Low speed (νr  = 2 kHz for TiN, ZrN, and GaN; νr  = 1 kHz for InN) and 'high speed' (νr  = 15 kHz for TiN; νr  = 5 kHz for ZrN; νr  = 10 kHz for InN and GaN) MAS NMR experiments were performed. For TiN, ZrN, InN, and GaN, powder-XRD was used to identify the phases present in each sample. The number of peaks observed for each sample in their (14) N MAS solid-state NMR spectrum matches perfectly well with the number of nitrogen-containing phases identified by powder-XRD. The (14) N MAS solid-state NMR spectra are symmetric and dominated by the quadrupolar interaction. The envelopes of the spinning sidebands manifold are Lorentzian, and it is concluded that there is a distribution of the quadrupolar coupling constants Qcc 's arising from structural defects in the compounds studied. Copyright © 2015 John Wiley & Sons, Ltd. PMID:26687421

  6. Electrochemical nitridation of metal surfaces

    SciTech Connect

    Wang, Heli; Turner, John A.

    2015-06-30

    Electrochemical nitridation of metals and the produced metals are disclosed. An exemplary method of electrochemical nitridation of metals comprises providing an electrochemical solution at low temperature. The method also comprises providing a three-electrode potentiostat system. The method also comprises stabilizing the three-electrode potentiostat system at open circuit potential. The method also comprises applying a cathodic potential to a metal.

  7. Epitaxial relationship of semipolar s-plane (1101) InN grown on r-plane sapphire

    SciTech Connect

    Dimitrakopulos, G. P.

    2012-07-02

    The heteroepitaxy of semipolar s-plane (1101) InN grown directly on r-plane sapphire by plasma-assisted molecular beam epitaxy is studied using transmission electron microscopy techniques. The epitaxial relationship is determined to be (1101){sub InN} Parallel-To (1102){sub Al{sub 2O{sub 3}}}, [1120]{sub InN} Parallel-To [2021]{sub Al{sub 2O{sub 3}}}, [1102]{sub InN}{approx} Parallel-To [0221]{sub Al{sub 2O{sub 3}}}, which ensures a 0.7% misfit along [1120]{sub InN}. Two orientation variants are identified. Proposed geometrical factors contributing to the high density of basal stacking faults, partial dislocations, and sphalerite cubic pockets include the misfit accommodation and reduction, as well as the accommodation of lattice twist.

  8. Strain distribution of thin InN epilayers grown on (0001) GaN templates by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Delimitis, A.; Komninou, Ph.; Dimitrakopulos, G. P.; Kehagias, Th.; Kioseoglou, J.; Karakostas, Th.; Nouet, G.

    2007-02-01

    A structural characterization of thin InN films is performed to determine the post-growth strain distribution, using electron microscopy techniques. A 60° misfit dislocation network at the InN /GaN interface effectively accommodates the lattice mismatch. The InN in-plane lattice parameter, which remained practically constant throughout the epilayer thickness, was precisely determined by electron diffraction analysis, and cross-section and plan-view lattice images. Image analysis using the geometric phase and projection methods revealed a uniform distribution of the residual tensile strain along the growth and lateral directions. The in-plane strain is primarily attributed to InN island coalescence during the initial stages of growth.

  9. R&W Club Frederick Raises $1,500 for The Children’s Inn at Annual Golf Tournament | Poster

    Cancer.gov

    Forty-four government and contractor employees, along with their friends and family members, took to the Maryland National Golf Club course this fall for a cause. The R&W Club Frederick held its third annual golf tournament at the Middletown, Md., golf course on Sept. 14 to raise funds for The Children’s Inn at NIH, which celebrated its 25th anniversary this year. The Inn provides support and a home away from home for seriously ill children and their families receiving treatment at the NIH Clinical Center. Through the tournament, the club raised approximately $1,500 for The Children’s Inn, according to Tanya Ransom, biologist, NCI Center for Cancer Research, and secretary of the R&W Club Frederick. She also coordinated the golf tournament. After the tournament, a silent auction of sports memorabilia and collectibles, sponsored by Great Moments, Frederick, was held, and a portion of the proceeds also went to the Inn.

  10. High-quality InN films on GaN using graded InGaN buffers by MBE

    NASA Astrophysics Data System (ADS)

    Islam, SM; Protasenko, Vladimir; Rouvimov, Sergei; (Grace Xing, Huili; Jena, Debdeep

    2016-05-01

    The growth of high-quality thick InN films is challenging because of the lack of native substrates. In this work, we demonstrate the use of a linearly graded InGaN buffer layer for the growth of InN films on GaN substrates. A 500 nm InN film with <0.1 nm RMS roughness is obtained with a peak mobility of 1410 cm2/(V·s) at 300 K. A strong room temperature photoluminescence showing a bandgap of 0.65 eV with 79 meV linewidth is observed. A graded InGaN buffer is found to lead to extremely smooth and high-quality InN films.

  11. Study of InN nanorods growth mechanism using ultrathin Au layer by plasma-assisted MBE on Si(111)

    NASA Astrophysics Data System (ADS)

    Kumar, Mahesh; Rajpalke, Mohana K.; Roul, Basanta; Bhat, Thirumaleshwara N.; Krupanidhi, S. B.

    2014-01-01

    InN nanorods (NRs) were grown on Si(111) substrate by plasma-assisted molecular beam epitaxy. The growth of InN NRs has been demonstrated using an electron-beam evaporated (~2 nm) Au layer prior to the initiation of growth. The structure and morphology of as deposited Au film, annealed at 600 °C, and InN NRs were investigated using X-ray photoelectron spectroscopy and scanning electron microscopy. Chemical characterization was performed with energy dispersive X-ray analysis. Single-crystalline wurtzite structure of InN NRs is verified by transmission electron microscopy. The formation process of NRs is investigated and a qualitative mechanism is proposed.

  12. 40 CFR 421.190 - Applicability: Description of the secondary indium subcategory.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... secondary indium subcategory. 421.190 Section 421.190 Protection of Environment ENVIRONMENTAL PROTECTION... CATEGORY Secondary Indium Subcategory § 421.190 Applicability: Description of the secondary indium... indium at secondary indium facilities processing spent electrolyte solutions and scrap indium metal...

  13. 40 CFR 421.190 - Applicability: Description of the secondary indium subcategory.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... secondary indium subcategory. 421.190 Section 421.190 Protection of Environment ENVIRONMENTAL PROTECTION... CATEGORY Secondary Indium Subcategory § 421.190 Applicability: Description of the secondary indium... indium at secondary indium facilities processing spent electrolyte solutions and scrap indium metal...

  14. 40 CFR 421.190 - Applicability: Description of the secondary indium subcategory.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... secondary indium subcategory. 421.190 Section 421.190 Protection of Environment ENVIRONMENTAL PROTECTION... CATEGORY Secondary Indium Subcategory § 421.190 Applicability: Description of the secondary indium... indium at secondary indium facilities processing spent electrolyte solutions and scrap indium metal...

  15. 40 CFR 421.190 - Applicability: Description of the secondary indium subcategory.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... secondary indium subcategory. 421.190 Section 421.190 Protection of Environment ENVIRONMENTAL PROTECTION... CATEGORY Secondary Indium Subcategory § 421.190 Applicability: Description of the secondary indium... indium at secondary indium facilities processing spent electrolyte solutions and scrap indium metal...

  16. 40 CFR 421.190 - Applicability: Description of the secondary indium subcategory.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... secondary indium subcategory. 421.190 Section 421.190 Protection of Environment ENVIRONMENTAL PROTECTION... CATEGORY Secondary Indium Subcategory § 421.190 Applicability: Description of the secondary indium... indium at secondary indium facilities processing spent electrolyte solutions and scrap indium metal...

  17. InN Nanorods and Epi-layers: Similarities and Differences

    SciTech Connect

    Liliental-Weber, Z.; Kryliouk, O.; Park, H.J.; Mangum, J.; Anderson, T.; Schaff, W.

    2007-03-30

    Transmission electron microscopy was applied to study InN nanorods grown on the a-, c-and r-plane of Al{sub 2}O{sub 3}, and (111) Si substrates by non-catalytic, template-free hydride metal-organic vapor phase epitaxy (H-MOVPE). Single crystal nanorod growth was obtained on all substrates. However, the shape of the nanorods varied depending on the substrate used. For example, nanorods grown on r-plane sapphire and (111) Si have sharp tips. In contrast, growth on a- and c- planes of Al{sub 2}O{sub 3} results in flat tips with clear facets on their sides. The structural quality of these nanorods and their growth polarity are compared to crystalline quality, surface roughness, defects and growth polarity of InN layers grown by MBE on the same planes of Al{sub 2}O{sub 3}.

  18. Metastable nature of InN and In-rich InGaN alloys

    NASA Astrophysics Data System (ADS)

    Ivanov, S. V.; Shubina, T. V.; Komissarova, T. A.; Jmerik, V. N.

    2014-10-01

    The paper provides a thermodynamic insight into the metastable nature of InN and In-rich InGaN alloys, based on experimental studies of their plasma-assisted MBE growth and high-temperature decomposition, as well as on theoretical modeling of nitrogen vacancy behavior. This instability may easily result in occurrence of metallic In nanoparticles in the bulk of In(Ga)N films and in the vicinity of extended defects at high enough In content, which makes us consider this material as a metal-semiconductor composite. An overview of a wide set of experimental studies performed by us on the epitaxial films grown in many laboratories all around the world is given which proves an existence of such In nanoparticles in the films and shows how they affect optical and electrical properties of the epilayers. Possible applications of epitaxial InN layers for THz emitters and magnetic field sensors are discussed.

  19. Solar hot water system installed at Days Inn Motel, Dallas, Texas (Valley View)

    SciTech Connect

    1980-09-01

    The solar hot water system installed in the Days Inns of America, Inc., Days Inn Motel (120 rooms), I-35/2276 Valley View Lane, Dallas, Texas is described. The solar system was designed by ILI Incorporated to provide 65 percent of the total domestic hot water (DHW) demand. The Solar Energy Products, model CU-30WW liquid (water) flat plate collector (1000 square feet) system automatically drains into the 1000 gallon steel storage tank when the solar pump is not running. This system is one of eleven systems planned. Heat is transferred from the DHW tanks through a shell and tube heat exchanger. A circulating pump between the DHW tanks and heat exchanger enables solar heated water to help make up standby losses. All pumps are controlled by differential temperature controllers. The operation of this system was begun March 11, 1980. The solar components were partly funded ($15,000 of 30,000 cost) by a Department of Energy grant.

  20. Thermal Stability of Chelated Indium Activable Tracers

    SciTech Connect

    Chrysikopoulos, Costas; Kruger, Paul

    1986-01-21

    The thermal stability of indium tracer chelated with organic ligands ethylenediaminetetraacetic acid (EDTA) and nitrilotriacetic acid (NTA) was measured for reservoir temperatures of 150, 200, and 240 C. Measurements of the soluble indium concentration was made as a function of time by neutron activation analysis. From the data, approximate thermal decomposition rates were estimated. At 150 C, both chelated tracers were stable over the experimental period of 20 days. At 200 C, the InEDTA concentration remained constant for 16 days, after which the thermal decomposition occurred at a measured rate constant of k = 0.09 d{sup -1}. The thermal decomposition of InNTA at 200 C showed a first order reaction with a measured rate constant of k = 0.16 d{sup -1}. At 240 C, both indium chelated tracers showed rapid decomposition with rate constants greater than 1.8 d{sup -1}. The data indicate that for geothermal reservoir with temperatures up to about 200 C, indium chelated tracers can be used effectively for transit times of at least 20 days. These experiments were run without reservoir rock media, and do not account for concomitant loss of indium tracer by adsorption processes.

  1. Functionalized boron nitride nanotubes

    DOEpatents

    Sainsbury, Toby; Ikuno, Takashi; Zettl, Alexander K

    2014-04-22

    A plasma treatment has been used to modify the surface of BNNTs. In one example, the surface of the BNNT has been modified using ammonia plasma to include amine functional groups. Amine functionalization allows BNNTs to be soluble in chloroform, which had not been possible previously. Further functionalization of amine-functionalized BNNTs with thiol-terminated organic molecules has also been demonstrated. Gold nanoparticles have been self-assembled at the surface of both amine- and thiol-functionalized boron nitride Nanotubes (BNNTs) in solution. This approach constitutes a basis for the preparation of highly functionalized BNNTs and for their utilization as nanoscale templates for assembly and integration with other nanoscale materials.

  2. Gallium nitride nanotube lasers

    SciTech Connect

    Li, Changyi; Liu, Sheng; Hurtado, Antonio; Wright, Jeremy Benjamin; Xu, Huiwen; Luk, Ting Shan; Figiel, Jeffrey J.; Brener, Igal; Brueck, Steven R. J.; Wang, George T.

    2015-01-01

    Lasing is demonstrated from gallium nitride nanotubes fabricated using a two-step top-down technique. By optically pumping, we observed characteristics of lasing: a clear threshold, a narrow spectral, and guided emission from the nanotubes. In addition, annular lasing emission from the GaN nanotube is also observed, indicating that cross-sectional shape control can be employed to manipulate the properties of nanolasers. The nanotube lasers could be of interest for optical nanofluidic applications or application benefitting from a hollow beam shape.

  3. Synthesis and characterization of actinide nitrides

    SciTech Connect

    Jaques, Brian; Butt, Darryl P.; Marx, Brian M.; Hamdy, A.S.; Osterberg, Daniel; Balfour, Gordon

    2007-07-01

    A carbothermic reduction of the metal oxides in a hydrogen/nitrogen mixed gas stream prior to nitriding in a nitrogen gas stream was used to synthesize uranium nitride at 1500 deg. C, cerium nitride at 1400 deg. C, and dysprosium nitride at 1500 deg. C. Cerium nitride and dysprosium nitride were also synthesized via hydriding and nitriding the metal shavings at 900 deg. C and 1500 deg. C, respectively. Also, a novel ball-milling synthesis route was used to produce cerium nitride and dysprosium nitride from the metal shavings at room temperature. Dysprosium nitride was also produced by reacting the metal shavings in a high purity nitrogen gas stream at 1300 deg. C. All materials were characterized by phase analysis via X-ray diffraction. Only the high purity materials were further analyzed via chemical analysis to characterize the trace oxygen concentration. (authors)

  4. Indium oxide/n-silicon heterojunction solar cells

    DOEpatents

    Feng, Tom; Ghosh, Amal K.

    1982-12-28

    A high photo-conversion efficiency indium oxide/n-silicon heterojunction solar cell is spray deposited from a solution containing indium trichloride. The solar cell exhibits an Air Mass One solar conversion efficiency in excess of about 10%.

  5. Indium: bringing liquid-crystal displays into focus

    USGS Publications Warehouse

    Mercer, Celestine N.

    2015-01-01

    Compared to more abundant industrial metals such as lead and zinc, information about the behavior and toxicity of indium in the environment is limited. However, many indium compounds have been proven to be toxic to animals.

  6. On the crystalline structure, stoichiometry and band gap of InN thin films

    SciTech Connect

    Yu, K.M.; Liliental-Weber, Z.; Walukiewicz, W.; Li, S.X.; Jones, R.E.; Shan, W.; Ager III, J.W.; Haller, E.E.; Lu, Hai; Schaff, William J.

    2004-09-23

    Detailed transmission electron microscopy (TEM), x-ray diffraction (XRD), and optical characterization of a variety of InN thin films grown by molecular beam epitaxy under both optimized and non-optimized conditions is reported. Optical characterization by absorption and photoluminescence confirms that the band gap of single crystalline and polycrystalline wurtzite InN is 0.70 {+-} 0.05 eV. Films grown under optimized conditions with a AlN nucleation layer and a GaN buffer layer are stoichiometric, single crystalline wurtzite structure with dislocation densities not exceeding mid-10{sup 10} cm{sup -2}. Non-optimal films can be poly-crystalline and display an XRD diffraction feature at 2{theta} {approx} 33{sup o}; this feature has been attributed by others to the presence of metallic In clusters. Careful indexing of wide angle XRD scans and selected area diffraction patterns shows that this peak is in fact due to the presence of polycrystalline InN grains; no evidence of metallic In clusters was found in any of the studied samples.

  7. Photoelectrochemical properties of InN nanowire photoelectrodes for solar water splitting

    NASA Astrophysics Data System (ADS)

    Kamimura, J.; Bogdanoff, P.; Ramsteiner, M.; Geelhaar, L.; Riechert, H.

    2016-07-01

    InN nanowires were grown on Si(111) substrates by plasma-assisted molecular beam epitaxy. Raman spectroscopy showed that the nanowires were strain-free and allowed the deduction of a free carrier concentration of 1–2 × 1018 cm‑3. This value was confirmed by a Mott–Schottky analysis of electrolyte-based capacitance-voltage measurements. In addition, these measurements directly revealed the existence of a surface accumulation layer in the InN nanowires. In cyclic voltammetry measurements under irradiation from a Xe lamp with about 100 mW cm‑2, high photocurrents of about 4 and 11 mA cm‑2 were observed at 1.23 and 1.63 V bias potential versus reversible hydrogen electrode, respectively, using H2O2 as a hole scavenger. By comparing the photocurrent with and without H2O2, the main limiting factor in the performance of InN nanowire photoanodes was identified to be the poor catalytic efficiency for water oxidation at the surface, followed by parasitic bulk recombination.

  8. Effects of hole localization on limiting p-type conductivity in oxide and nitride semiconductors

    SciTech Connect

    Lyons, J. L.; Janotti, A.; Van de Walle, C. G.

    2014-01-07

    We examine how hole localization limits the effectiveness of substitutional acceptors in oxide and nitride semiconductors and explain why p-type doping of these materials has proven so difficult. Using hybrid density functional calculations, we find that anion-site substitutional impurities in AlN, GaN, InN, and ZnO lead to atomic-like states that localize on the impurity atom itself. Substitution with cation-site impurities, on the other hand, triggers the formation of polarons that become trapped on nearest-neighbor anions, generally leading to large ionization energies for these acceptors. Unlike shallow effective-mass acceptors, these two types of deep acceptors couple strongly with the lattice, significantly affecting the optical properties and severely limiting prospects for achieving p-type conductivity in these wide-band-gap materials.

  9. Indium-111 leukocyte scanning and fracture healing

    SciTech Connect

    Mead, L.P.; Scott, A.C.; Bondurant, F.J.; Browner, B.D. )

    1990-01-01

    This study was undertaken to determine the specificity of indium-111 leukocyte scans for osteomyelitis when fractures are present. Midshaft tibial osteotomies were performed in 14 New Zealand white rabbits, seven of which were infected postoperatively with Staphylococcus aureus per Norden's protocol. All 14 rabbits were scanned following injection with 75 microCi of indium 111 at 72 h after osteotomy and at weekly intervals for 4 weeks. Before the rabbits were killed, the fracture sites were cultured to document the presence or absence of infection. The results of all infected osteotomy sites were positive, whereas no positive scans were found in the noninfected osteotomies. We concluded from this study that uncomplicated fracture healing does not result in a positive indium-111 leukocyte scan.

  10. A modern perspective on the history of semiconductor nitride blue light sources

    NASA Astrophysics Data System (ADS)

    Maruska, Herbert Paul; Rhines, Walden Clark

    2015-09-01

    In this paper we shall discuss the development of blue light-emitting (LED) and laser diodes (LD), starting early in the 20th century. Various materials systems were investigated, but in the end, the nitrides of aluminum, gallium and indium proved to be the most effective. Single crystal thin films of GaN first emerged in 1968. Blue light-emitting diodes were first reported in 1971. Devices grown in the 1970s were prepared by the halide transport method, and were never efficient enough for commercial products due to contamination. Devices created by metal-organic vapor-phase epitaxy gave far superior performance. Actual true blue LEDs based on direct band-to-band transitions, free of recombination through deep levels, were finally developed in 1994, leading to a breakthrough in LED performance, as well as nitride based laser diodes in 1996. In 2014, the scientists who achieved these critical results were awarded the Nobel Prize in Physics.