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Sample records for ion implantation technique

  1. Ion Implantation

    NASA Astrophysics Data System (ADS)

    Langouche, G.; Yoshida, Y.

    In this tutorial we describe the basic principles of the ion implantation technique and we demonstrate that emission Mössbauer spectroscopy is an extremely powerful technique to investigate the atomic and electronic configuration around implanted atoms. The physics of dilute atoms in materials, the final lattice sites and their chemical state as well as diffusion phenomena can be studied. We focus on the latest developments of implantation Mössbauer spectroscopy, where three accelerator facilities, i.e., Hahn-Meitner Institute Berlin, ISOLDE-CERN and RIKEN, have intensively been used for materials research in in-beam and on-line Mössbauer experiments immediately after implantation of the nuclear probes.

  2. Develop techniques for ion implantation of PLZT for adaptive optics

    NASA Astrophysics Data System (ADS)

    Craig, R. A.; Batishko, C. R.; Brimhall, J. L.; Pawlewicz, W. T.; Stahl, K. A.

    1989-11-01

    Battelle Pacific Northwest Laboratory (PNL) conducted research into the preparation and characterization of ion-implanted adaptive optic elements based on lead-lanthanum-zirconate-titanate (PLZT). Over the 4-yr effort beginning FY 1985, the ability to increase the photosensitivity of PLZT and extend it to longer wavelengths was developed. The emphasis during the last two years was to develop a model to provide a basis for choosing implantation species and parameters. Experiments which probe the electronic structure were performed on virgin and implanted PLZT samples. Also performed were experiments designed to connect the developing conceptual model with the experimental results. The emphasis in FY 1988 was to extend the photosensitivity out to diode laser wavelengths. The experiments and modelling effort indicate that manganese will form appropriate intermediate energy states to achieve the longer wavelength photosensitivity. Preliminary experiments were also conducted to deposit thin film PLZT.

  3. Properties of ion implanted Ti-6Al-4V processed using beamline and PSII techniques

    SciTech Connect

    Walter, K.C.; Woodring, J.S.; Nastasi, M.; Munson, C.M.; Williams, J.M.; Poker, D.B.

    1996-12-31

    The surface of Ti-6Al-4V (Ti64) alloy has been modified using beamline implantation of boron. In separate experiments, Ti64 has been implanted with nitrogen using a plasma source ion implantation (PSII) technique utilizing either ammonia (NH{sub 3}), nitrogen (N{sub 2}), or their combinations as the source of nitrogen ions. Beamline experiments have shown the hardness of the N-implanted surface saturates at a dose level of {approximately} 4 {times} 10{sup 17} at/cm{sup 2} at {approximately} 10 GPa. The present work makes comparisons of hardness and tribological tests of (1) B implantation using beamline techniques, and (2) N implanted samples using ammonia and/or nitrogen gas in a PSII process. The results show that PSII using N{sub 2} or NH{sub 3} gives similar hardness as N implantation using a beamline process. The presence of H in the Ti alloy surface does not affect the hardness of the implanted surface. Boron implantation increased the surface hardness by as much as 2.5x at the highest dose level. Wear testing by a pin-on-disk method indicated that nitrogen implantation reduced the wear rate by as much as 120x, and boron implantation reduced the wear rate by 6.5x. Increased wear resistance was accompanied by a decreased coefficient of friction.

  4. Zinc ion implantation-deposition technique improves the osteoblast biocompatibility of titanium surfaces

    PubMed Central

    LIANG, YONGQIANG; XU, JUAN; CHEN, JING; QI, MENGCHUN; XIE, XUEHONG; HU, MIN

    2015-01-01

    The plasma immersion ion implantation and deposition (PIIID) technique was used to implant zinc (Zn) ions into smooth surfaces of pure titanium (Ti) disks for investigation of tooth implant surface modification. The aim of the present study was to evaluate the surface structure and chemical composition of a modified Ti surface following Zn ion implantation and deposition and to examine the effect of such modification on osteoblast biocompatibility. Using the PIIID technique, Zn ions were deposited onto the smooth surface of pure Ti disks. The physical structure and chemical composition of the modified surface layers were characterized by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS), respectively. In vitro culture assays using the MG-63 bone cell line were performed to determine the effects of Zn-modified Ti surfaces following PIIID on cellular function. Acridine orange staining was used to detect cell attachment to the surfaces and cell cycle analysis was performed using flow cytometry. SEM revealed a rough ‘honeycomb’ structure on the Zn-modified Ti surfaces following PIIID processing and XPS data indicated that Zn and oxygen concentrations in the modified Ti surfaces increased with PIIID processing time. SEM also revealed significantly greater MG-63 cell growth on Zn-modified Ti surfaces than on pure Ti surfaces (P<0.05). Flow cytometric analysis revealed increasing percentages of MG-63 cells in S phase with increasing Zn implantation and deposition, suggesting that MG-63 apoptosis was inhibited and MG-63 proliferation was promoted on Zn-PIIID-Ti surfaces. The present results suggest that modification with Zn-PIIID may be used to improve the osteoblast biocompatibility of Ti implant surfaces. PMID:25673139

  5. Low-temperature technique of thin silicon ion implanted epitaxial detectors

    NASA Astrophysics Data System (ADS)

    Kordyasz, A. J.; Le Neindre, N.; Parlog, M.; Casini, G.; Bougault, R.; Poggi, G.; Bednarek, A.; Kowalczyk, M.; Lopez, O.; Merrer, Y.; Vient, E.; Frankland, J. D.; Bonnet, E.; Chbihi, A.; Gruyer, D.; Borderie, B.; Ademard, G.; Edelbruck, P.; Rivet, M. F.; Salomon, F.; Bini, M.; Valdré, S.; Scarlini, E.; Pasquali, G.; Pastore, G.; Piantelli, S.; Stefanini, A.; Olmi, A.; Barlini, S.; Boiano, A.; Rosato, E.; Meoli, A.; Ordine, A.; Spadaccini, G.; Tortone, G.; Vigilante, M.; Vanzanella, E.; Bruno, M.; Serra, S.; Morelli, L.; Guerzoni, M.; Alba, R.; Santonocito, D.; Maiolino, C.; Cinausero, M.; Gramegna, F.; Marchi, T.; Kozik, T.; Kulig, P.; Twaróg, T.; Sosin, Z.; Gaşior, K.; Grzeszczuk, A.; Zipper, W.; Sarnecki, J.; Lipiński, D.; Wodzińska, H.; Brzozowski, A.; Teodorczyk, M.; Gajewski, M.; Zagojski, A.; Krzyżak, K.; Tarasiuk, K. J.; Khabanowa, Z.; Kordyasz, Ł.

    2015-02-01

    A new technique of large-area thin ion implanted silicon detectors has been developed within the R&D performed by the FAZIA Collaboration. The essence of the technique is the application of a low-temperature baking process instead of high-temperature annealing. This thermal treatment is performed after B+ ion implantation and Al evaporation of detector contacts, made by using a single adjusted Al mask. Extremely thin silicon pads can be therefore obtained. The thickness distribution along the X and Y directions was measured for a prototype chip by the energy loss of α-particles from 241Am (< E α > = 5.5 MeV). Preliminary tests on the first thin detector (area ≈ 20 × 20 mm2) were performed at the INFN-LNS cyclotron in Catania (Italy) using products emitted in the heavy-ion reaction 84Kr ( E = 35 A MeV) + 112Sn. The ΔE - E ion identification plot was obtained using a telescope consisting of our thin ΔE detector (21 μm thick) followed by a typical FAZIA 510 μm E detector of the same active area. The charge distribution of measured ions is presented together with a quantitative evaluation of the quality of the Z resolution. The threshold is lower than 2 A MeV depending on the ion charge.

  6. New Techniques for Simulation of Ion Implantation by Numerical Integration of Boltzmann Transport Equation

    NASA Astrophysics Data System (ADS)

    Wang, Shyh-Wei; Guo, Shuang-Fa

    1998-01-01

    New techniques for more accurate and efficient simulation of ion implantations by a stepwise numerical integration of the Boltzmann transport equation (BTE) have been developed in this work. Instead of using uniform energy grid, a non-uniform grid is employed to construct the momentum distribution matrix. A more accurate simulation result is obtained for heavy ions implanted into silicon. In the same time, rather than utilizing the conventional Lindhard, Nielsen and Schoitt (LNS) approximation, an exact evaluation of the integrals involving the nuclear differential scattering cross-section (dσn=2πp dp) is proposed. The impact parameter p as a function of ion energy E and scattering angle φ is obtained by solving the magic formula iteratively and an interpolation techniques is devised during the simulation process. The simulation time using exact evaluation is about 3.5 times faster than that using the Littmark and Ziegler (LZ) spline fitted cross-section function for phosphorus implantation into silicon.

  7. Ion implanters contamination on wafer surface analyzed by ToF-SIMS and SPV analytical techniques

    NASA Astrophysics Data System (ADS)

    Ricciari, R.; Bertini, M.; Ferlito, E. P.; Pizzo, G.; Anastasi, G.; Mello, D.; Franco, G.

    2007-04-01

    In ULSI processes, metallic contamination controls are very important issues. For the ion implantation process it is known that several sources of contaminations still need to be controlled: metals from sputtering of the apertures or wafer holders, Na+ contaminations from filament impurities and messy maintenance procedure. ToF-SIMS is one of the most promising candidates to perform in-line surface analysis due to its high sensitivity. It is very common to use surface photo-voltage (SPV) techniques to control ion implanter equipments but this kind of analysis is an indirect measure for metallic contamination. The aim of this work is to study the possibility to use ToF-SIMS instead of SPV for in line equipment contamination monitoring. For this reason a comparison between SPV and ToF-SIMS data occurred. Good correlation between the data is shown; moreover ToF-SIMS spectra give detailed information about the other contaminations present on the wafer surface.

  8. Improved bio-tribology of biomedical alloys by ion implantation techniques

    NASA Astrophysics Data System (ADS)

    Díaz, C.; Lutz, J.; Mändl, S.; García, J. A.; Martínez, R.; Rodríguez, R. J.

    2009-05-01

    Surface modification of biomaterials by conventional ion implantation (II) and plasma immersion ion implantation (PI3) are innovative methods to improve the biocompatibility of these advanced materials. This paper describes the biocompatibility improvements of Ti6Al4V and Co28Cr6Mo implanted with N and O in a conventional implantation and a plasma immersion ion implantation processes. Tribo-corrosion friction and wear tests were performed in a realistic environment - in Hank's solution - to investigate the introduced modifications. The wear performance was only slightly improved due to a thin layer thickness, whereas, in contrast, the corrosion rate was significantly reduced.

  9. Tungsten coatings deposited on CFC tiles by the combined magnetron sputtering and ion implantation technique

    NASA Astrophysics Data System (ADS)

    Ruset, C.; Grigore, E.; Maier, H.; Neu, R.; Li, X.; Dong, H.; Mitteau, R.; Courtois, X.

    2007-03-01

    Combined magnetron sputtering and ion implantation (CMSII) is a deposition technique involving simultaneous magnetron sputtering and high energy ion bombardment of the coating during its growth. A high voltage pulse discharge (U=40 kV, τ=20 μs, f=25 Hz) is superposed over the magnetron deposition and in this way, positive ions are accelerated to the components to be coated, bombarding initially the substrate and then the coating itself. In the framework of the ITER-like wall project this method was applied to produce nanostructured W coatings on the carbon fibre composite (CFC) substrate. These coatings have been characterized in terms of adhesion, thickness, structure and resistance to high thermal loads (up to 23.5 MW m-2). Based on the results of these tests, which are presented in this paper, CMSII technology was selected for coating about 1100 tiles with a 10 μm tungsten layer for the JET first wall and divertor.

  10. Trends and techniques for space base electronics. [mathematical models, ion implantation, and semiconductors

    NASA Technical Reports Server (NTRS)

    Gassaway, J. D.; Mahmood, Q.; Trotter, J. D.

    1978-01-01

    A system was developed for depositing aluminum and aluminum alloys by the D.C. sputtering technique. This system which was designed for a high level of cleanliness and ion monitoring the deposition parameters during film preparation is ready for studying the deposition and annealing parameters upon double level metal preparation. The finite element method was studied for use in the computer modeling of two dimensional MOS transistor structures. An algorithm was developed for implementing a computer study which is based upon the finite difference method. The program was modified and used to calculate redistribution data for boron and phosphorous which had been predeposited by ion implantation with range and straggle conditions typical of those used at MSFC. Data were generated for 111 oriented SOS films with redistribution in N2, dry O2 and steam ambients. Data are given showing both two dimensional effects and the evolution of the junction depth, sheet resistance and integrated dose with redistribution time.

  11. A feasibility study of ion implantation techniques for mass spectrometer calibration

    NASA Technical Reports Server (NTRS)

    Koslin, M. E.; Krycuk, G. A.; Schatz, J. G., Jr.; White, F. A.; Wood, G. M.

    1978-01-01

    An experimental study was undertaken to examine the feasibility of using ion-implanted filaments doped with either an alkali metal or noble gas for in situ recalibration of onboard mass spectrometers during extended space missions. Implants of rubidium and krypton in rhenium ribbon filaments were subsequently tested in a bakeable 60 deg sector mass spectrometer operating in the static mode. Surface ionization and electron impact ion sources were both used, each yielding satisfactory results. The metallic implant with subsequent ionization provided a means of mass scale calibration and determination of system operating parameters, whereas the noble gas thermally desorbed into the system was more suited for partial pressure and sensitivity determinations.

  12. Novel plasma immersion ion implantation and deposition hardware and technique based on high power pulsed magnetron discharge

    SciTech Connect

    Wu Zhongzhen; Tian Xiubo; Shi Jingwei; Wang Zeming; Gong Chunzhi; Yang Shiqin; Chu, Paul K.

    2011-03-15

    A novel plasma immersion ion implantation technique based on high power pulsed magnetron sputtering (HPPMS) discharge that can produce a high density metal plasma is described. The metal plasma is clean and does not suffer from contamination from macroparticles, and the process can be readily scaled up for industrial production. The hardware, working principle, and operation modes are described. A matching circuit is developed to modulate the high-voltage and HPPMS pulses to enable operation under different modes such as simultaneous implantation and deposition, pure implantation, and selective implantation. To demonstrate the efficacy of the system and technique, CrN films with a smooth and dense surface without macroparticles were produced. An excellent adhesion with a critical load of 59.9 N is achieved for the pure implantation mode.

  13. Formation of nonlinear optical waveguides by using ion-exchange and implantation techniques

    NASA Astrophysics Data System (ADS)

    Arnold, G. W.; de Marchi, G.; Gonella, F.; Mazzoldi, P.; Quaranta, A.; Battaglin, G.; Catalano, M.; Garrido, F.; Haglund, R. F., Jr.

    1996-08-01

    Composite materials consisting of metal nanoclusters embedded in glass matrices have been obtained by the combined use of ion-exchange and ion implantation processes, with possible application in the design of nonlinear all-optical switching devices. Optical waveguides containing either silver or copper clusters have been fabricated. Optical absorption and electron microscopy have been performed to detect the presence of metal clusters. Preliminary measurements have been also performed of the optical nonlinear response on both silver- and copper-containing glasses.

  14. Ion sources for ion implantation technology (invited)

    SciTech Connect

    Sakai, Shigeki Hamamoto, Nariaki; Inouchi, Yutaka; Umisedo, Sei; Miyamoto, Naoki

    2014-02-15

    Ion sources for ion implantation are introduced. The technique is applied not only to large scale integration (LSI) devices but also to flat panel display. For LSI fabrication, ion source scheduled maintenance cycle is most important. For CMOS image sensor devices, metal contamination at implanted wafer is most important. On the other hand, to fabricate miniaturized devices, cluster ion implantation has been proposed to make shallow PN junction. While for power devices such as silicon carbide, aluminum ion is required. For doping processes of LCD fabrication, a large ion source is required. The extraction area is about 150 cm × 10 cm, and the beam uniformity is important as well as the total target beam current.

  15. Broad beam ion implanter

    DOEpatents

    Leung, Ka-Ngo

    1996-01-01

    An ion implantation device for creating a large diameter, homogeneous, ion beam is described, as well as a method for creating same, wherein the device is characterized by extraction of a diverging ion beam and its conversion by ion beam optics to an essentially parallel ion beam. The device comprises a plasma or ion source, an anode and exit aperture, an extraction electrode, a divergence-limiting electrode and an acceleration electrode, as well as the means for connecting a voltage supply to the electrodes.

  16. Broad beam ion implanter

    DOEpatents

    Leung, K.N.

    1996-10-08

    An ion implantation device for creating a large diameter, homogeneous, ion beam is described, as well as a method for creating same, wherein the device is characterized by extraction of a diverging ion beam and its conversion by ion beam optics to an essentially parallel ion beam. The device comprises a plasma or ion source, an anode and exit aperture, an extraction electrode, a divergence-limiting electrode and an acceleration electrode, as well as the means for connecting a voltage supply to the electrodes. 6 figs.

  17. Develop techniques for ion implantation of PLZT (lead-lanthanum-zirconate-titanate) for adaptive optics

    SciTech Connect

    Batishko, C.R.; Brimhall, J.L.; Pawlewicz, W.T.; Stahl, K.A.; Toburen, L.H.

    1987-07-01

    Research was conducted at Pacific Northwest Laboratory to develop high photosensitivity adaptive optical elements utilizing ion implanted lanthanum-doped lead-zirconate-titanate (PLZT). One centimeter square samples were prepared by implanting ferroelectric and anti-ferroelectric PLZT with a variety of species or combinations of species. These included Ne, O, Ni, Ne/Cr, Ne/Al, Ne/Ni, Ne/O, and Ni/O, at a variety of energies and fluences. An indium-tin oxide (ITO) electrode coating was designed to give a balance of high conductivity and optical transmission at near uv to near ir wavelengths. Samples were characterized for photosensitivity; implanted layer thickness, index of refraction, and density; electrode (ITO) conductivity; and in some cases, residual stress curvature. Thin film anti-ferroelectric PLZT was deposited in a preliminary experiment. The structure was amorphous with x-ray diffraction showing the beginnings of a structure at substrate temperatures of approximately 550/sup 0/C. This report summarizes the research and provides a sampling of the data taken during the report period.

  18. Ion implantation in silicate glasses

    SciTech Connect

    Arnold, G.W.

    1993-12-01

    This review examines the effects of ion implantation on the physical properties of silicate glasses, the compositional modifications that can be brought about, and the use of metal implants to form colloidal nanosize particles for increasing the nonlinear refractive index.

  19. Semiconductor Ion Implanters

    SciTech Connect

    MacKinnon, Barry A.; Ruffell, John P.

    2011-06-01

    In 1953 the Raytheon CK722 transistor was priced at $7.60. Based upon this, an Intel Xeon Quad Core processor containing 820,000,000 transistors should list at $6.2 billion. Particle accelerator technology plays an important part in the remarkable story of why that Intel product can be purchased today for a few hundred dollars. Most people of the mid twentieth century would be astonished at the ubiquity of semiconductors in the products we now buy and use every day. Though relatively expensive in the nineteen fifties they now exist in a wide range of items from high-end multicore microprocessors like the Intel product to disposable items containing 'only' hundreds or thousands like RFID chips and talking greeting cards. This historical development has been fueled by continuous advancement of the several individual technologies involved in the production of semiconductor devices including Ion Implantation and the charged particle beamlines at the heart of implant machines. In the course of its 40 year development, the worldwide implanter industry has reached annual sales levels around $2B, installed thousands of dedicated machines and directly employs thousands of workers. It represents in all these measures, as much and possibly more than any other industrial application of particle accelerator technology. This presentation discusses the history of implanter development. It touches on some of the people involved and on some of the developmental changes and challenges imposed as the requirements of the semiconductor industry evolved.

  20. Semiconductor Ion Implanters

    NASA Astrophysics Data System (ADS)

    MacKinnon, Barry A.; Ruffell, John P.

    2011-06-01

    In 1953 the Raytheon CK722 transistor was priced at 7.60. Based upon this, an Intel Xeon Quad Core processor containing 820,000,000 transistors should list at 6.2 billion! Particle accelerator technology plays an important part in the remarkable story of why that Intel product can be purchased today for a few hundred dollars. Most people of the mid twentieth century would be astonished at the ubiquity of semiconductors in the products we now buy and use every day. Though relatively expensive in the nineteen fifties they now exist in a wide range of items from high-end multicore microprocessors like the Intel product to disposable items containing `only' hundreds or thousands like RFID chips and talking greeting cards. This historical development has been fueled by continuous advancement of the several individual technologies involved in the production of semiconductor devices including Ion Implantation and the charged particle beamlines at the heart of implant machines. In the course of its 40 year development, the worldwide implanter industry has reached annual sales levels around 2B, installed thousands of dedicated machines and directly employs thousands of workers. It represents in all these measures, as much and possibly more than any other industrial application of particle accelerator technology. This presentation discusses the history of implanter development. It touches on some of the people involved and on some of the developmental changes and challenges imposed as the requirements of the semiconductor industry evolved.

  1. Ion implantation at elevated temperatures

    SciTech Connect

    Lam, N.Q.; Leaf, G.K.

    1985-11-01

    A kinetic model has been developed to investigate the synergistic effects of radiation-enhanced diffusion, radiation-induced segregation and preferential sputtering on the spatial redistribution of implanted solutes during implantation at elevated temperatures. Sample calculations were performed for Al and Si ions implanted into Ni. With the present model, the influence of various implantation parameters on the evolution of implant concentration profiles could be examined in detail.

  2. Metal Ion Sources for Ion Beam Implantation

    SciTech Connect

    Zhao, W. J.; Zhao, Z. Q.; Ren, X. T.

    2008-11-03

    In this paper a theme touched upon the progress of metal ion sources devoted to metal ion beam implantation (MIBI) will be reviewed. A special emphasis will be given to some kinds of ion sources such as ECR, MEVVA and Cluster ion sources. A novel dual hollow cathode metal ion source named DUHOCAMIS will be introduced and discussed.

  3. Ion implantation into concave polymer surface

    NASA Astrophysics Data System (ADS)

    Sakudo, N.; Shinohara, T.; Amaya, S.; Endo, H.; Okuji, S.; Ikenaga, N.

    2006-01-01

    A new technique for ion implantation into concave surface of insulating materials is proposed and experimentally studied. The principle is roughly described by referring to modifying inner surface of a PET (polyethylene terephthalate) bottle. An electrode that is supplied with positive high-voltage pulses is inserted into the bottle. Both plasma formation and ion implantation are simultaneously realized by the same high-voltage pulses. Ion sheath with a certain thickness that depends on plasma parameters is formed just on the inner surface of the bottle. Since the plasma potential is very close to that of the electrode, ions from the plasma are accelerated in the sheath and implanted perpendicularly into the bottle's inner surface. Laser Raman spectroscopy shows that the inner surface of an ion-implanted PET bottle is modified into DLC (diamond-like carbon). Gas permeation measurement shows that gas-barrier property enhances due to the modification.

  4. Tungsten contamination in ion implantation

    NASA Astrophysics Data System (ADS)

    Polignano, M. L.; Barbarossa, F.; Galbiati, A.; Magni, D.; Mica, I.

    2016-06-01

    In this paper the tungsten contamination in ion implantation processes is studied by DLTS analysis both in typical operating conditions and after contamination of the implanter by implantation of wafers with an exposed tungsten layer. Of course the contaminant concentration is orders of magnitude higher after contamination of the implanter, but in addition our data show that different mechanisms are active in a not contaminated and in a contaminated implanter. A moderate tungsten contamination is observed also in a not contaminated implanter, however in that case contamination is completely not energetic and can be effectively screened by a very thin oxide. On the contrary, the contamination due to an implantation in a previously contaminated implanter is reduced but not suppressed even by a relatively thick screen oxide. The comparison with SRIM calculations confirms that the observed deep penetration of the contaminant cannot be explained by a plain sputtering mechanism.

  5. Graphene synthesis by ion implantation

    NASA Astrophysics Data System (ADS)

    Garaj, Slaven; Hubbard, William; Golovchenko, J. A.

    2010-11-01

    We demonstrate an ion implantation method for large-scale synthesis of high quality graphene films with controllable thickness. Thermally annealing polycrystalline nickel substrates that have been ion implanted with carbon atoms results in the surface growth of graphene films whose average thickness is controlled by implantation dose. The graphene film quality, as probed with Raman and electrical measurements, is comparable to previously reported synthesis methods. The implantation synthesis method can be generalized to a variety of metallic substrates and growth temperatures, since it does not require a decomposition of chemical precursors or a solvation of carbon into the substrate.

  6. Graphene synthesis by ion implantation.

    PubMed

    Garaj, Slaven; Hubbard, William; Golovchenko, J A

    2010-11-01

    We demonstrate an ion implantation method for large-scale synthesis of high quality graphene films with controllable thickness. Thermally annealing polycrystalline nickel substrates that have been ion implanted with carbon atoms results in the surface growth of graphene films whose average thickness is controlled by implantation dose. The graphene film quality, as probed with Raman and electrical measurements, is comparable to previously reported synthesis methods. The implantation synthesis method can be generalized to a variety of metallic substrates and growth temperatures, since it does not require a decomposition of chemical precursors or a solvation of carbon into the substrate. PMID:21124725

  7. Graphene synthesis by ion implantation

    PubMed Central

    Garaj, Slaven; Hubbard, William; Golovchenko, J. A.

    2010-01-01

    We demonstrate an ion implantation method for large-scale synthesis of high quality graphene films with controllable thickness. Thermally annealing polycrystalline nickel substrates that have been ion implanted with carbon atoms results in the surface growth of graphene films whose average thickness is controlled by implantation dose. The graphene film quality, as probed with Raman and electrical measurements, is comparable to previously reported synthesis methods. The implantation synthesis method can be generalized to a variety of metallic substrates and growth temperatures, since it does not require a decomposition of chemical precursors or a solvation of carbon into the substrate. PMID:21124725

  8. Key issues in plasma source ion implantation

    SciTech Connect

    Rej, D.J.; Faehl, R.J.; Matossian, J.N.

    1996-09-01

    Plasma source ion implantation (PSII) is a scaleable, non-line-of-sight method for the surface modification of materials. In this paper, we consider three important issues that should be addressed before wide-scale commercialization of PSII: (1) implant conformality; (2) ion sources; and (3) secondary electron emission. To insure uniform implanted dose over complex shapes, the ion sheath thickness must be kept sufficiently small. This criterion places demands on ion sources and pulsed-power supplies. Another limitation to date is the availability of additional ion species beyond B, C, N, and 0. Possible solutions are the use of metal arc vaporization sources and plasma discharges in high-vapor-pressure organometallic precursors. Finally, secondary electron emission presents a potential efficiency and x-ray hazard issue since for many metallurgic applications, the emission coefficient can be as large as 20. Techniques to suppress secondary electron emission are discussed.

  9. Ion implantations of oxide dispersion strengthened steels

    NASA Astrophysics Data System (ADS)

    Sojak, S.; Simeg Veternikova, J.; Slugen, V.; Petriska, M.; Stacho, M.

    2015-12-01

    This paper is focused on a study of radiation damage and thermal stability of high chromium oxide dispersion strengthened steel MA 956 (20% Cr), which belongs to the most perspective structural materials for the newest generation of nuclear reactors - Generation IV. The radiation damage was simulated by the implantation of hydrogen ions up to the depth of about 5 μm, which was performed at a linear accelerator owned by Slovak University of Technology. The ODS steel MA 956 was available for study in as-received state after different thermal treatments as well as in ions implanted state. Energy of the hydrogen ions chosen for the implantation was 800 keV and the implantation fluence of 6.24 × 1017 ions/cm2. The investigated specimens were measured by non-destructive technique Positron Annihilation Lifetime Spectroscopy in order to study the defect behavior after different thermal treatments in the as-received state and after the hydrogen ions implantation. Although, different resistance to defect production was observed in individual specimens of MA 956 during the irradiation, all implanted specimens contain larger defects than the ones in as-received state.

  10. Mutation breeding by ion implantation

    NASA Astrophysics Data System (ADS)

    Yu, Zengliang; Deng, Jianguo; He, Jianjun; Huo, Yuping; Wu, Yuejin; Wang, Xuedong; Lui, Guifu

    1991-07-01

    Ion implantation as a new mutagenic method has been used in the rice breeding program since 1986, and for mutation breeding of other crops later. It has been shown, in principle and in practice, that this method has many outstanding advantages: lower damage rate; higher mutation rate and wider mutational spectrum. Many new lines of rice with higher yield rate; broader disease resistance; shorter growing period but higher quality have been bred from ion beam induced mutants. Some of these lines have been utilized for the intersubspecies hybridization. Several new lines of cotton, wheat and other crops are now in breeding. Some biophysical effects of ion implantation for crop seeds have been studied.

  11. Ion implanted dielectric elastomer circuits

    NASA Astrophysics Data System (ADS)

    O'Brien, Benjamin M.; Rosset, Samuel; Anderson, Iain A.; Shea, Herbert R.

    2013-06-01

    Starfish and octopuses control their infinite degree-of-freedom arms with panache—capabilities typical of nature where the distribution of reflex-like intelligence throughout soft muscular networks greatly outperforms anything hard, heavy, and man-made. Dielectric elastomer actuators show great promise for soft artificial muscle networks. One way to make them smart is with piezo-resistive Dielectric Elastomer Switches (DES) that can be combined with artificial muscles to create arbitrary digital logic circuits. Unfortunately there are currently no reliable materials or fabrication process. Thus devices typically fail within a few thousand cycles. As a first step in the search for better materials we present a preliminary exploration of piezo-resistors made with filtered cathodic vacuum arc metal ion implantation. DES were formed on polydimethylsiloxane silicone membranes out of ion implanted gold nano-clusters. We propose that there are four distinct regimes (high dose, above percolation, on percolation, low dose) in which gold ion implanted piezo-resistors can operate and present experimental results on implanted piezo-resistors switching high voltages as well as a simple artificial muscle inverter. While gold ion implanted DES are limited by high hysteresis and low sensitivity, they already show promise for a range of applications including hysteretic oscillators and soft generators. With improvements to implanter process control the promise of artificial muscle circuitry for soft smart actuator networks could become a reality.

  12. High energy implantation with high-charge-state ions in a vacuum arc ion implanter

    SciTech Connect

    Oks, E.M. |; Anders, A.; Brown, I.G.; Dickinson, M.R.; MacGill, R.A.

    1996-08-01

    Ion implantation energy can in principal be increased by increasing the charge states of the ions produced by the ion source rather than by increasing the implanter operating voltage, providing an important savings in cost and size of the implanter. In some recent work the authors have shown that the charge states of metal ions produced in a vacuum arc ion source can be elevated by a strong magnetic field. In general, the effect of both high arc current and high magnetic field is to push the distribution to higher charge states--the mean ion charge state is increased and new high charge states are formed. The effect is significant for implantation application--the mean ion energy can be about doubled without change in extraction voltage. Here they describe the ion source modifications, the results of time-of-flight measurements of ion charge state distributions, and discuss the use and implications of this technique as a means for doing metal iron implantation in the multi-hundreds of keV ion energy range.

  13. Ion-implantation damage in silicate glasses

    NASA Astrophysics Data System (ADS)

    Arnold, G. W.

    Ion implantation is a rapid technique for simulating damage induced by alpha recoil nuclei in nuclear waste forms. The simulation has been found to be quite good in TEM comparisons with natural alpha decay damage in minerals, but leach rate differences have been observed in glass studies and were attributed to dose rate differences. The similarities between ion implantation and recoil nuclei as a means of producing damage suggest that insights into the long term behavior of glass waste forms can be obtained by examination of what is known about ion implantation damage in silicate glasses. This paper briefly reviews these effects and shows that leaching results in certain nuclear waste glasses can be understood as resulting from plastic flow and track overlap. Phase separation is also seen to be a possible consequence of damage induced compositional changes.

  14. Applications of ion implantation for high efficiency silicon solar cells

    NASA Technical Reports Server (NTRS)

    Minnucci, J. A.; Kirkpatrick, A. R.

    1977-01-01

    Ion implantation is utilized for the dopant introduction processes necessary to fabricate a silicon solar cell. Implantation provides a versatile powerful tool for development of high efficiency cells. Advantages and problems of implantation and the present status of developmental use of the technique for solar cells are discussed.

  15. Mutagenesis of Arabidopsis Thaliana by N+ Ion Implantation

    NASA Astrophysics Data System (ADS)

    Zhang, Genfa; Shi, Xiaoming; Nie, Yanli; Jiang, Shan; Zhou, Hongyu; Lu, Ting; Zhang, Jun

    2006-05-01

    Ion implantation, as a new biophysically mutagenic technique, has shown a great potential for crop breeding. By analyzing polymorphisms of genomic DNA through RAPD-based DNA analysis, we compared the frequency and efficiency of somatic and germ-line mutations of Arabidopsis thaliana treated with N+ ion implantation and γ-rays radiation. Our data support the following conclusions: (1) N+ ion implantation can induce a much wider spectrum of mutations than γ-rays radiation does; (2) Unlike the linear correlation between the doses and their effect in γ-rays radiation, the dose-effect correlation in N+ ion implantation is nonlinear; (3) Like γ-rays radiation, both somatic and germ-line mutations could be induced by N+ ion implantation; and (4) RAPD deletion patterns are usually seen in N+ ion implantation induced mutation.

  16. Contamination Control in Ion Implantation

    SciTech Connect

    Eddy, R.; Doi, D.; Santos, I.; Wriggins, W.

    2011-01-07

    The investigation and elimination or control of metallic contamination in ion implanters has been a leading, continuous effort at implanter OEMs and in fabs/IDMs alike. Much of the efforts have been in the area of control of sputtering through material and geometry changes in apertures, beamline and target chamber components. In this paper, we will focus on an area that has not, heretofore, been fully investigated or controlled. This is the area of lubricants and internal and external support material such as selected cleaning media. Some of these materials are designated for internal use (beamline/vacuum) only while others are for internal and/or external use. Many applications for selected greases, for example, are designated for or are used for platens, implant disks/wheels and for wafer handling components. We will present data from popular lubricants (to be unnamed) used worldwide in ion implanters. This paper will review elements of concern in many lubricants that should be tracked and monitored by all fabs.Proper understanding of the characteristics, risks and the control of these potential contaminants can provide for rapid return to full process capability following major PMs or parts changes. Using VPD-ICPMS, Glow Discharge Mass Spectrometry and Ion Chromatography (IC) data, we will review the typical cleaning results and correlation to ''on wafer'' contamination by elements of concern--and by some elements that are otherwise barred from the fab.

  17. New implantation techniques for improved solar cell junctions

    NASA Technical Reports Server (NTRS)

    Spitzer, M. B.; Bunker, S. N.

    1982-01-01

    Ion implantation techniques offering improved cell performance and reduced cost have been studied. These techniques include non-mass-analyzed phosphorus implantation, argon implantation gettering, and low temperature boron annealing. It is found that cells produced by non-mass-analyzed implantation perform as well as mass-analyzed controls, and that the cell performance is largely independent of process parameters. A study of argon implantation gettering shows no improvement over non-gettered controls. Results of low temperature boron annealing experiments are presented.

  18. Electrocatalysis on ion-implanted electrodes

    SciTech Connect

    O'Grady, W E; Wolf, G K

    1981-01-01

    The oxidation of formic acid and methanol has been stuidied on electrodes prepared by ion implanting Pt in RuO/sup 2/. Formic acid was found to oxidize readily on this catalyst without poisoning the surface. In the case of methanol no reaction was found to take place. Using XPS techniques, Pt was shown to have a lower binding energy than bulk Pt. This suggests that there is excess charge on this form of Pt which changes its reactivity.

  19. ION SOURCES FOR ENERGY EXTREMES OF ION IMPLANTATION.

    SciTech Connect

    HERSCHCOVITCH,A.; JOHNSON, B.M.; BATALIN, V.A.; KROPACHEV, G.N.; KUIBEDA, R.P.; KULEVOY, T.V.; KOLOMIETS, A.A.; PERSHIN, V.I.; PETRENKO, S.V.; RUDSKOY, I.; SELEZNEV, D.N.; BUGAEV, A.S.; GUSHENETS, V.I.; LITOVKO, I.V.; OKS, E.M.; YUSHKOV, G. YU.; MASEUNOV, E.S.; POLOZOV, S.M.; POOLE, H.J.; STOROZHENKO, P.A.; SVAROVSKI, YA.

    2007-08-26

    For the past four years a joint research and development effort designed to develop steady state, intense ion sources has been in progress with the ultimate goal to develop ion sources and techniques, which meet the two energy extreme range needs of mega-electron-volt and 100's of electron-volt ion implanters. This endeavor has already resulted in record steady state output currents of high charge state of Antimony and Phosphorous ions: P{sup 2+} (8.6 pmA), P{sup 3+} (1.9 pmA), and P{sup 4+} (0.12 pmA) and 16.2, 7.6, 3.3, and 2.2 pmA of Sb{sup 3+} Sb{sup 4+}, Sb{sup 5+}, and Sb{sup 6+} respectively. For low energy ion implantation our efforts involve molecular ions and a novel plasmaless/gasless deceleration method. To date, 1 emA of positive Decaborane ions were extracted at 10 keV and smaller currents of negative Decaborane ions were also extracted. Additionally, Boron current fraction of over 70% was extracted from a Bemas-Calutron ion source, which represents a factor of 3.5 improvement over currently employed ion sources.

  20. Effects of ion beam mixing on the formation of SiGe nanocrystals by ion implantation

    SciTech Connect

    Zhu, J.G.; White, C.W.; Budai, J.D.; Withrow, S.P.; Henderson, D.O.

    1996-06-01

    Nanocrystals of SiGe alloy have been formed inside a SiO{sub 2} matrix by the ion implantation technique. It is demonstrated that the sequence of implantation of Si and Ge ions affects the nanocrystal formation significantly. This is explained by the ion beam mixing effect during sequential implantation. The size distributions of the SiGe nanocrystals can also be controlled by annealing conditions.

  1. Surface mechanical properties - effects of ion implantation

    NASA Astrophysics Data System (ADS)

    Herman, Herbert

    1981-05-01

    Ion implantation has been used to modify the mechanical properties of a wide range of metals and alloys. The affected properties which have been studied include friction and wear, erosion and fatigue. Both BCC and FCC systems have been examined, with the major effort being directed at the former, due to the strong influence of interstitial implantants on mechanical properties of BCC and because of the industrial utility of these alloys. In seeking the microstructural origins of these sometimes dramatic effects, researchers have employed numerous surface analysis techniques, including backscattering and electron spectroscopy, TEM, SEM, X-ray and Mössbauer analysis and internal friction measurements. The interactions of surface dislocation structures with implantation-induced imperfections, surface alloying, and precipitation phenomena are discussed. A review is given of the current status of activities as represented by a number of research groups.

  2. Industrial applications of ion implantation into metal surfaces

    SciTech Connect

    Williams, J.M.

    1987-07-01

    The modern materials processing technique, ion implantation, has intriguing and attractive features that stimulate the imaginations of scientists and technologists. Success of the technique for introducing dopants into semiconductors has resulted in a stable and growing infrastructure of capital equipment and skills for use of the technique in the economy. Attention has turned to possible use of ion implantation for modification of nearly all surface related properties of materials - optical, chemical and corrosive, tribological, and several others. This presentation provides an introduction to fundamental aspects of equipment, technique, and materials science of ion implantation. Practical and economic factors pertaining to the technology are discussed. Applications and potential applications are surveyed. There are already available a number of ion-implanted products, including ball-and-roller bearings and races, punches-and-dies, injection screws for plastics molding, etc., of potential interest to the machine tool industry.

  3. Production of Endohedral Fullerenes by Ion Implantation

    SciTech Connect

    Diener, M.D.; Alford, J. M.; Mirzadeh, S.

    2007-05-31

    The empty interior cavity of fullerenes has long been touted for containment of radionuclides during in vivo transport, during radioimmunotherapy (RIT) and radioimaging for example. As the chemistry required to open a hole in fullerene is complex and exceedingly unlikely to occur in vivo, and conformational stability of the fullerene cage is absolute, atoms trapped within fullerenes can only be released during extremely energetic events. Encapsulating radionuclides in fullerenes could therefore potentially eliminate undesired toxicity resulting from leakage and catabolism of radionuclides administered with other techniques. At the start of this project however, methods for production of transition metal and p-electron metal endohedral fullerenes were completely unknown, and only one method for production of endohedral radiofullerenes was known. They therefore investigated three different methods for the production of therapeutically useful endohedral metallofullerenes: (1) implantation of ions using the high intensity ion beam at the Oak Ridge National Laboratory (ORNL) Surface Modification and Characterization Research Center (SMAC) and fullerenes as the target; (2) implantation of ions using the recoil energy following alpha decay; and (3) implantation of ions using the recoil energy following neutron capture, using ORNL's High Flux Isotope Reactor (HFIR) as a thermal neutron source. While they were unable to obtain evidence of successful implantation using the ion beam at SMAC, recoil following alpha decay and neutron capture were both found to be economically viable methods for the production of therapeutically useful radiofullerenes. In this report, the procedures for preparing fullerenes containing the isotopes {sup 212}Pb, {sup 212}Bi, {sup 213}Bi, and {sup 177}Lu are described. None of these endohedral fullerenes had ever previously been prepared, and all of these radioisotopes are actively under investigation for RIT. Additionally, the chemistry for

  4. A study of interface and adhesion of c-BN film on Si(1 0 0) modified by nitrogen plasma based ion implantation technique

    SciTech Connect

    Tian Jingze; Zhang Qing; Xia Lifang; Yoon, S.F.; Ahn, J.; Byon, E.S.; Zhou, Q.; Wang, S.G.; Li, J.Q.; Yang, D.J

    2004-06-08

    Cubic boron nitride (c-BN) films were deposited on Si substrate with poor adhesion using magnetically enhanced active reaction evaporation (ME-ARE). An attempt has been made to enhance the adhesion strength between c-BN film and substrate by nitrogen plasma based ion implantation (PBII) into c-BN film. Nitrogen ion doses range from 5x10{sup 16} to 1x10{sup 17} ions cm{sup -2} at an implant voltage of 50 kV. The nitrogen ion implanted c-BN films were analyzed using FTIR, scratch test, and XPS to investigate the change of structure, adhesion strength of c-BN film, and interfacial mixing between the initial turbostratic BN (t-BN) film layer and substrate caused by nitrogen ion implantation. FTIR spectra showed little change of c-BN phase content in the films under the above implantation conditions but XPS depth elemental profile of N{sup +}-implanted boron nitride films displayed a mixed layer consisting of elements from film and substrate formed at interface. A highly optimized dynamic Monte Carlo program TAMIX was used to simulate the PBII process in a good agreement with above measured depth elemental profile. The scratch test showed that the adhesion strength evaluated in terms of the critical load of N{sup +}-implanted c-BN film was 1.4 times higher than that of as deposited c-BM film.

  5. Controlled ion implant damage profile for etching

    DOEpatents

    Arnold, Jr., George W.; Ashby, Carol I. H.; Brannon, Paul J.

    1990-01-01

    A process for etching a material such as LiNbO.sub.3 by implanting ions having a plurality of different kinetic energies in an area to be etched, and then contacting the ion implanted area with an etchant. The various energies of the ions are selected to produce implant damage substantially uniformly throughout the entire depth of the zone to be etched, thus tailoring the vertical profile of the damaged zone.

  6. Ion implantation processing of GaN epitaxial layers

    SciTech Connect

    Tan, H.H.; Williams, J.S.; Zou, J.; Cockayne, D.J.H.; Pearton, S.J.; Yuan, C.

    1996-12-31

    Ion implantation induced-damage build up in epitaxial GaN layers grown on sapphire has been analyzed by ion channeling and electron microscopy techniques. The epitaxial layers are extremely resistant to ion beam damage in that substantial dynamic annealing of implantation disorder occurs even at liquid nitrogen temperatures. Amorphous layers can be formed in some cases if the implantation dose is high enough. However, the damage (amorphous or complex extended defects) that is formed is also extremely difficult to remove during annealing and required temperatures in excess of 1,100 C.

  7. Ion implantation for corrosion inhibition of aluminum alloys in saline media

    SciTech Connect

    Williams, J.M. ); Gonzales, A. ); Quintana, J. ); Lee, I.-S.; Buchanan, R.A. ); Burns, F.C.; Culbertson, R.J.; Levy, M. . Materials Technology Lab.); Treglio, J.R. (ISM

    1990-01-01

    The effects of ion implantation treatments on corrosion of 2014 and 1100 aluminum in saline media were investigated. Implanted ions were N, Si, Ti and Cr. Techniques included salt spray testing, electrochemical studies, Rutherford backscattering spectrometry, and profilometry. It was concluded that ion implantation of Cr is of potential practical benefit for corrosion inhibition of 2014 Al in salt environments. 4 refs., 5 figs.

  8. Silicon on sapphire for ion implantation studies

    NASA Technical Reports Server (NTRS)

    Pisciotta, B. P.

    1974-01-01

    Van der Pauw or bridge samples are ultrasonically cut from silicon on sapphire wafers. Contact pad regions are implanted with moderately heavy dose of ions. Ion of interest is implanted into sample; and, before being annealed in vacuum, sample is sealed with sputtered layer of silicon dioxide. Nickel or aluminum is sputtered onto contact pad areas and is sintered in nitrogen atmosphere.

  9. Pulsed source ion implantation apparatus and method

    DOEpatents

    Leung, K.N.

    1996-09-24

    A new pulsed plasma-immersion ion-implantation apparatus that implants ions in large irregularly shaped objects to controllable depth without overheating the target, minimizing voltage breakdown, and using a constant electrical bias applied to the target. Instead of pulsing the voltage applied to the target, the plasma source, for example a tungsten filament or a RF antenna, is pulsed. Both electrically conducting and insulating targets can be implanted. 16 figs.

  10. Pulsed source ion implantation apparatus and method

    DOEpatents

    Leung, Ka-Ngo

    1996-01-01

    A new pulsed plasma-immersion ion-implantation apparatus that implants ions in large irregularly shaped objects to controllable depth without overheating the target, minimizing voltage breakdown, and using a constant electrical bias applied to the target. Instead of pulsing the voltage applied to the target, the plasma source, for example a tungsten filament or a RF antenna, is pulsed. Both electrically conducting and insulating targets can be implanted.

  11. Method of fabricating optical waveguides by ion implantation doping

    DOEpatents

    Appleton, Bill R.; Ashley, Paul R.; Buchal, Christopher J.

    1989-01-01

    A method for fabricating high-quality optical waveguides in optical quality oxide crystals by ion implantation doping and controlled epitaxial recrystallization is provided. Masked LiNbO.sub.3 crystals are implanted with high concentrations of Ti dopant at ion energies of about 350 keV while maintaining the crystal near liquid nitrogen temperature. Ion implantation doping produces an amorphous, Ti-rich nonequilibrium phase in the implanted region. Subsequent thermal annealing in a water-saturated oxygen atmosphere at up to 1000.degree. C. produces solid-phase epitaxial regrowth onto the crystalline substrate. A high-quality single crystalline layer results which incorporates the Ti into the crystal structure at much higher concentrations than is possible by standard diffusion techniques, and this implanted region has excellent optical waveguides properties.

  12. Method of fabricating optical waveguides by ion implantation doping

    DOEpatents

    Appleton, B.R.; Ashley, P.R.; Buchal, C.J.

    1987-03-24

    A method for fabricating high-quality optical waveguides in optical quality oxide crystals by ion implantation doping and controlled epitaxial recrystallization is provided. Masked LiNbO/sub 3/ crystals are implanted with high concentrations of Ti dopant at ion energies of about 360 keV while maintaining the crystal near liquid nitrogen temperature. Ion implantation doping produces an amorphous, Ti-rich nonequilibrium phase in the implanted region. Subsequent thermal annealing in a water-saturated oxygen atmosphere at up to 1000/degree/C produces solid-phase epitaxial regrowth onto the crystalline substrate. A high-quality crystalline layer results which incorporates the Ti into the crystal structure at much higher concentrations than is possible by standard diffusion techniques, and this implanted region has excellent optical waveguiding properties.

  13. Surface modification of sapphire by ion implantation

    SciTech Connect

    McHargue, C.J.

    1998-11-01

    The range of microstructures and properties of sapphire (single crystalline Al{sub 2}O{sub 3}) that are produced by ion implantation are discussed with respect to the implantation parameters of ion species, fluence, irradiation temperature and the orientation of the ion beam relative to crystallographic axes. The microstructure of implanted sapphire may be crystalline with varying concentrations of defects or it may be amorphous perhaps with short-range order. At moderate to high fluences, implanted metallic ions often coalesce into pure metallic colloids and gas ions form bubbles. Many of the implanted microstructural features have been identified from studies using transmission electron microscopy (TEM), optical spectroscopy, Moessbauer spectroscopy, and Rutherford backscattering-channeling. The chemical, mechanical, and physical properties reflect the microstructures.

  14. Photoluminescence spectroscopy and Rutherford backscattering channeling evaluation of various capping techniques for rapid thermal annealing of ion-implanted ZnSe

    SciTech Connect

    Allen, E.L.; Zach, F.X.; Yu, K.M.; Bourret, E.D.

    1994-05-01

    We report on the effectiveness of proximity caps and PECVD Si{sub 3}N{sub 4}caps during annealing of implanted ZnSe films. OMVPE ZnSe films were grown using diisopropylselenide (DIPSe) and diethylzinc (DEZn) precursors, then ion-implanted with 1 {times} 10{sup 14} cm{sup {minus}2} N (33 keV) or Ne (45 keV) at room temperature and liquid nitrogen temperature, and rapid thermal annealed at temperatures between 200C and 850C. Rutherford backscattering spectrometry in the channeling orientation was used to investigate damage recovery, and photoluminescence spectroscopy was used to investigate crystal quality and the formation of point defects. Low temperature implants were found to have better luminescence properties than room temperature implants, and results show that annealing, time and temperature may be more important than capping material in determining the optical properties. Effects of various caps, implant and annealing temperature are discussed in terms of photoluminescence spectra.

  15. Ion implantation and laser annealing

    NASA Astrophysics Data System (ADS)

    Three ion implantation and laser annealing projects have been performed by ORNL through the DOE sponsored Seed Money Program. The research has contributed toward improving the characteristics of wear, hardness, and corrosion resistance of some metals and ceramics, as well as the electrical properties of semiconductors. The work has helped to spawn related research, at ORNL and elsewhere, concerning the relationships between microstructure and materials properties. ORNL research has resulted in major advances in extended life and non-corrosive artificial joints (hip and knee), high performance semiconductors, failure resistant ceramics (with potential energy applications), and solar cells. The success of the seed money projects was instrumental in the formation of ORNL's Surface Modification and Characterization Facility (SMAC). More than 60 universities and companies have participated in SMAC programs.

  16. Rapid thermal process-induced recombination centers in ion implanted silicon

    NASA Astrophysics Data System (ADS)

    Eichhammer, W.; Hage-Ali, M.; Stuck, R.; Siffert, P.

    1990-04-01

    This work presents direct evidence for a correlation between rapid thermal process-induced recombination centers and co-implanted metallic impurities in ion implanted silicon. Experimental evidence includes the dose dependence of the minority carrier diffusion length measured by the SPV technique, SIMS and RBS analysis of high-dose implantations which show the presence of heavy metals, the dependence of the final diffusion lengths on the mass of the implanted ions, as well as the successful modification of an implantation equipment.

  17. Development of vertical compact ion implanter for gemstones applications

    NASA Astrophysics Data System (ADS)

    Intarasiri, S.; Wijaikhum, A.; Bootkul, D.; Suwannakachorn, D.; Tippawan, U.; Yu, L. D.; Singkarat, S.

    2014-08-01

    Ion implantation technique was applied as an effective non-toxic treatment of the local Thai natural corundum including sapphires and rubies for the enhancement of essential qualities of the gemstones. Energetic oxygen and nitrogen ions in keV range of various fluences were implanted into the precious stones. It has been thoroughly proved that ion implantation can definitely modify the gems to desirable colors together with changing their color distribution, transparency and luster properties. These modifications lead to the improvement in quality of the natural corundum and thus its market value. Possible mechanisms of these modifications have been proposed. The main causes could be the changes in oxidation states of impurities of transition metals, induction of charge transfer from one metal cation to another and the production of color centers. For these purposes, an ion implanter of the kind that is traditionally used in semiconductor wafer fabrication had already been successfully applied for the ion beam bombardment of natural corundum. However, it is not practical for implanting the irregular shape and size of gem samples, and too costly to be economically accepted by the gem and jewelry industry. Accordingly, a specialized ion implanter has been requested by the gem traders. We have succeeded in developing a prototype high-current vertical compact ion implanter only 1.36 m long, from ion source to irradiation chamber, for these purposes. It has been proved to be very effective for corundum, for example, color improvement of blue sapphire, induction of violet sapphire from low value pink sapphire, and amelioration of lead-glass-filled rubies. Details of the implanter and recent implantation results are presented.

  18. Dopant activation in ion implanted silicon by microwave annealing

    SciTech Connect

    Alford, T. L.; Thompson, D. C.; Mayer, J. W.; Theodore, N. David

    2009-12-01

    Microwaves are used as a processing alternative for the electrical activation of ion implanted dopants and the repair of ion implant damage within silicon. Rutherford backscattering spectra demonstrate that microwave heating reduces the damage resulting from ion implantation of boron or arsenic into silicon. Cross-section transmission electron microscopy and selective area electron diffraction patterns demonstrate that the silicon lattice regains nearly all of its crystallinity after microwave processing of arsenic implanted silicon. Sheet resistance readings indicate the time required for boron or arsenic electrical activation within implanted silicon. Hall measurements demonstrate the extent of dopant activation after microwave heating of implanted silicon. Physical and electrical characterization determined that the mechanism of recrystallization in arsenic implanted silicon is solid phase epitaxial regrowth. The boron implanted silicon samples did not result in enough lattice damage to amorphize the silicon lattice and resulted in low boron activation during microwave annealing even though recrystallization of the Si lattice damage did take place. Despite low boron activation levels, the level of boron activation in this work was higher than that expected from traditional annealing techniques. The kinetics of microwave heating and its effects on implanted Si are also discussed.

  19. Versatile high current metal ion implantation facility

    SciTech Connect

    Brown, I.G.; Dickinson, M.R.; Galvin, J.E.; Godechot, X.; MacGill, R.A.

    1991-06-01

    A metal ion implantation facility has been developed with which high current beams of practically all the solid metals of the periodic table can be produced. A multi-cathode, broad beam, metal vapor vacuum arc ion source is used to produce repetitively pulsed metal ion beams at an extraction voltage of up to 100 kV, corresponding to an ion energy of up to several hundred keV because of the ion-charge state multiplicity, and with a beam current of up to several amperes peak pulsed and several tens of mA time averaged delivered onto a downstream target. Implantation is done in a broad-beam mode, with a direct line-of-sight from ion source to target. Here we summarize some of the features of the ion source and the implantation facility that has been built up around it. 28 refs., 5 figs.

  20. Ion Implantation with Scanning Probe Alignment

    SciTech Connect

    Persaud, A.; Liddle, J.A.; Schenkel, T.; Bokor, J.; Ivanov, Tzv.; Rangelow, I.W.

    2005-07-12

    We describe a scanning probe instrument which integrates ion beams with the imaging and alignment function of a piezo-resistive scanning probe in high vacuum. The beam passes through several apertures and is finally collimated by a hole in the cantilever of the scanning probe. The ion beam spot size is limited by the size of the last aperture. Highly charged ions are used to show hits of single ions in resist, and we discuss the issues for implantation of single ions.

  1. Amorphization and defect recombination in ion implanted silicon carbide

    SciTech Connect

    Grimaldi, M.G.; Calcagno, L.; Musumeci, P.; Frangis, N.; Van Landuyt, J.

    1997-06-01

    The damage produced in silicon carbide single crystals by ion implantation was investigated by Rutherford backscattering channeling and transmission electron microscopy techniques. Implantations were performed at liquid nitrogen and at room temperatures with several ions to examine the effect of the ion mass and of the substrate temperature on the damaging process. The damage accumulation is approximately linear with fluence until amorphization occurs when the elastic energy density deposited by the ions overcomes a critical value. The critical energy density for amorphization depends on the substrate temperature and is greatest at 300 K indicating that defects recombination occurs already at room temperature. Formation of extended defects never occurred and point defects and uncollapsed clusters of point defects were found before amorphization even in the case of light ion implantation. The atomic displacement energy has been estimated to be {approximately}12 eV/atom from the analysis of the damage process in dilute collision cascades. {copyright} {ital 1997 American Institute of Physics.}

  2. Abridged Technique for Precise Implant Angulation.

    PubMed

    Perumal, Praveen; Chander, Gopi Naveen; Viswanathan, Anitha Kuttae; Reddy, Ramesh; Muthukumar, B

    2015-12-01

    Enormous scientific knowledge with evidence and clinical dexterity impart definitive ground for success in implant dentistry. Nevertheless, the unfeasibility to access the inner bone tissue makes the situation altogether more demanding. Presently the advent of numerous imaging techniques and associated surgical guide templates are documented for evaluation of implant angulation. However, they are not cost effective and consume more time to plan and design the structure. This article describes a simple concise technique for precise implant angulation. PMID:26816997

  3. Abridged Technique for Precise Implant Angulation

    PubMed Central

    Perumal, Praveen; Chander, Gopi Naveen; Reddy, Ramesh; Muthukumar, B.

    2015-01-01

    Enormous scientific knowledge with evidence and clinical dexterity impart definitive ground for success in implant dentistry. Nevertheless, the unfeasibility to access the inner bone tissue makes the situation altogether more demanding. Presently the advent of numerous imaging techniques and associated surgical guide templates are documented for evaluation of implant angulation. However, they are not cost effective and consume more time to plan and design the structure. This article describes a simple concise technique for precise implant angulation. PMID:26816997

  4. Photoreflectance Study of Boron Ion-Implanted (100) Cadmium Telluride

    NASA Technical Reports Server (NTRS)

    Amirtharaj, P. M.; Odell, M. S.; Bowman, R. C., Jr.; Alt, R. L.

    1988-01-01

    Ion implanted (100) cadmium telluride was studied using the contactless technique of photoreflectance. The implantations were performed using 50- to 400-keV boron ions to a maximum dosage of 1.5 x 10(16)/sq cm, and the annealing was accomplished at 500 C under vacuum. The spectral measurements were made at 77 K near the E(0) and E(1) critical points; all the spectra were computer-fitted to Aspnes' theory. The spectral line shapes from the ion damaged, partially recovered and undamaged, or fully recovered regions could be identified, and the respective volume fraction of each phase was estimated.

  5. PLEPS study of ions implanted RAFM steels

    NASA Astrophysics Data System (ADS)

    Sojak, S.; Slugeň, V.; Egger, W.; Ravelli, L.; Petriska, M.; Veterníková, J.; Stacho, M.; Sabelová, V.

    2014-04-01

    Current nuclear power plants (NPP) require radiation, heat and mechanical resistance of their structural materials with the ability to stay operational during NPP planned lifetime. Radiation damage much higher, than in the current NPP, is expected in new generations of nuclear power plants, such as Generation IV and fusion reactors. Investigation of perspective structural materials for new generations of nuclear power plants is among others focused on study of reduced activation ferritic/martensitic (RAFM) steels. These steels have good characteristics as reduced activation, good resistance to volume swelling, good radiation, and heat resistance. Our experiments were focused on the study of microstructural changes of binary Fe-Cr alloys with different chromium content after irradiation, experimentally simulated by ion implantations. Fe-Cr alloys were examined, by Pulsed Low Energy Positron System (PLEPS) at FRM II reactor in Garching (Munich), after helium ion implantations at the dose of 0.1 C/cm2. The investigation was focused on the chromium effect and the radiation defects resistivity. In particular, the vacancy type defects (monovacancies, vacancy clusters) have been studied. Based on our previous results achieved by conventional lifetime technique, the decrease of the defects size with increasing content of chromium is expected also for PLEPS measurements.

  6. Ion-implantation doping of silicon carbide

    SciTech Connect

    Gardner, J.; Edwards, A.; Rao, M.V.; Papanicolaou, N.; Kelner, G.; Holland, O.W.

    1997-10-01

    Because of their commercial availability in bulk single crystal form, the 6H- and 4H- polytypes of SiC are gaining importance for high-power, high-temperature, and high-frequency device applications. Selective area doping is a crucial processing step in integrated circuit manufacturing. In Si technology, selective area doping is accomplished by thermal diffusion or ion-implantation. Because of the low diffusion coefficients of most impurities in SiC, ion implantation is indispensable in SiC device manufacturing. In this paper the authors present their results on donor, acceptor, and compensation implants in 6H-SiC.

  7. Techniques for dental implant nanosurface modifications

    PubMed Central

    Bathala, Lakshmana Rao; Sangur, Rajashekar

    2014-01-01

    PURPOSE Dental implant has gained clinical success over last decade with the major drawback related to osseointegration as properties of metal (Titanium) are different from human bone. Currently implant procedures include endosseous type of dental implants with nanoscale surface characteristics. The objective of this review article is to summarize the role of nanotopography on titanium dental implant surfaces in order to improve osseointegration and various techniques that can generate nanoscale topographic features to titanium implants. MATERIALS AND METHODS A systematic electronic search of English language peer reviewed dental literature was performed for articles published between December 1987 to January 2012. Search was conducted in Medline, PubMed and Google scholar supplemented by hand searching of selected journals. 101 articles were assigned to full text analysis. Articles were selected according to inclusion and exclusion criterion. All articles were screened according to inclusion standard. 39 articles were included in the analysis. RESULTS Out of 39 studies, seven studies demonstrated that bone implant contact increases with increase in surface roughness. Five studies showed comparative evaluation of techniques producing microtopography and nanotopography. Eight studies concluded that osteoblasts preferably adhere to nano structure as compared to smooth surface. Six studies illustrated that nanotopography modify implant surface and their properties. Thirteen studies described techniques to produce nano roughness. CONCLUSION Modification of dental osseous implants at nanoscale level produced by various techniques can alter biological responses that may improve osseointegration and dental implant procedures. PMID:25558347

  8. Investigation on plasma immersion ion implantation treated medical implants.

    PubMed

    Mändl, S; Sader, R; Thorwarth, G; Krause, D; Zeilhofer, H-F; Horch, H H; Rauschenbach, B

    2002-08-01

    In this work the biocompatibility of osteosynsthesis plates treated with plasma immersion ion implantation (PIII) was tested using a rat model. Small rods (Ø 0.9 mm, and length 10 mm) prepared from different materials-pure Ti, anodised Ti, and two NiTi alloys (SE 508, and SM 495)-were implanted with oxygen by PIII to form a rutile surface layer and subsequently inserted into rat femurs, together with a control group of untreated samples. The results of the biomechanical tests correlate with the histological results, and show that plasma immersion ion implantation leads to an increase of biocompatibility and osseointegration of titanium and NiTi, albeit no improvement of the (bad) biocompatibility of the anodised Ti. Despite the layer thickness of up to 0.5 microm a strong influence of the base material is still present. PMID:12202173

  9. Metal plasma immersion ion implantation and deposition: A review

    SciTech Connect

    Anders, A.

    1996-09-01

    Metal Plasma Immersion Ion Implantation and Deposition (MePIIID) is a hybrid process combining cathodic arc deposition and plasma immersion ion implantation. The properties of metal plasma produced by vacuum arcs are reviewed and the consequences for MePIIID are discussed. Different version of MePIIID are described and compared with traditional methods of surface modification such as ion beam assisted deposition (IBAD). MePIIID is a very versatile approach because of the wide range of ion species and energies used. In one extreme case, films are deposited with ions in the energy range 20--50 eV, and at the other extreme, ions can be implanted with high energy (100 keV or more) without film deposition. Novel features of the technique include the use of improved macroparticle filters; the implementation of several plasma sources for multi-element surface modification; tuning of ion energy during implantation and deposition to tailor the substrate-film intermixed layer and structure of the growing film; simultaneous pulsing of the plasma potential (positive) and substrate bias (negative) with a modified Marx generator; and the use of high ion charge states.

  10. Method For Silicon Surface Texturing Using Ion Implantation

    SciTech Connect

    Kadakia, Nirag; Naczas, Sebastian; Bakhru, Hassaram; Huang Mengbing

    2011-06-01

    As the semiconductor industry continues to show more interest in the photovoltaic market, cheaper and readily integrable methods of silicon solar cell production are desired. One of these methods - ion implantation - is well-developed and optimized in all commercial semiconductor fabrication facilities. Here we have developed a silicon surface texturing technique predicated upon the phenomenon of surface blistering of H-implanted silicon, using only ion implantation and thermal annealing. We find that following the H implant with a second, heavier implant markedly enhances the surface blistering, causing large trenches that act as a surface texturing of c-Si. We have found that this method reduces total broadband Si reflectance from 35% to below 5percent;. In addition, we have used Rutherford backscattering/channeling measurements investigate the effect of ion implantation on the crystallinity of the sample. The data suggests that implantation-induced lattice damage is recovered upon annealing, reproducing the original monocrystalline structure in the previously amorphized region, while at the same time retaining the textured surface.

  11. Highly Stripped Ion Sources for MeV Ion Implantation

    SciTech Connect

    Hershcovitch, Ady

    2009-06-30

    Original technical objectives of CRADA number PVI C-03-09 between BNL and Poole Ventura, Inc. (PVI) were to develop an intense, high charge state, ion source for MeV ion implanters. Present day high-energy ion implanters utilize low charge state (usually single charge) ion sources in combination with rf accelerators. Usually, a MV LINAC is used for acceleration of a few rnA. It is desirable to have instead an intense, high charge state ion source on a relatively low energy platform (de acceleration) to generate high-energy ion beams for implantation. This de acceleration of ions will be far more efficient (in energy utilization). The resultant implanter will be smaller in size. It will generate higher quality ion beams (with lower emittance) for fabrication of superior semiconductor products. In addition to energy and cost savings, the implanter will operate at a lower level of health risks associated with ion implantation. An additional aim of the project was to producing a product that can lead to long­ term job creation in Russia and/or in the US. R&D was conducted in two Russian Centers (one in Tomsk and Seversk, the other in Moscow) under the guidance ofPVI personnel and the BNL PI. Multiple approaches were pursued, developed, and tested at various locations with the best candidate for commercialization delivered and tested at on an implanter at the PVI client Axcelis. Technical developments were exciting: record output currents of high charge state phosphorus and antimony were achieved; a Calutron-Bemas ion source with a 70% output of boron ion current (compared to 25% in present state-of-the-art). Record steady state output currents of higher charge state phosphorous and antimony and P ions: P{sup 2+} (8.6 pmA), P{sup 3+} (1.9 pmA), and P{sup 4+} (0.12 pmA) and 16.2, 7.6, 3.3, and 2.2 pmA of Sb{sup 3+} Sb {sup 4 +}, Sb{sup 5+}, and Sb{sup 6+} respectively. Ultimate commercialization goals did not succeed (even though a number of the products like high

  12. Photosensitivity and imaging characteristics of ion-implanted PLZT ceramics

    SciTech Connect

    Land, C.E.

    1985-01-01

    We reported in previous papers that both the near-uv and the visible photosensitivities of ferroelectric-phase PLZT (lead lanthanum zirconate titanate) ceramics are increased by as much as four orders of magnitude by ion implantation or a combination of thermal diffusion of Al and ion implantation. New results are presented here on high-energy (1 MeV) implants of Al and Ni and coimplants of Al + Ne and Ni + Ne, and these results are compared with earlier 500 keV implants of Al and Cr and coimplants of Al + Ne and Cr + Ne as surface modification techniques for increasing the visible photosensitivity of PLZT. The important role of grain size in determining optimum contrast and resolution of stored optical information is described in terms of new experimental results.

  13. Annealing of ion implanted gallium nitride

    SciTech Connect

    Tan, H.H.; Williams, J.S.; Zou, J.; Cockayne, D.J.; Pearton, S.J.; Zolper, J.C.; Stall, R.A.

    1998-03-01

    In this paper, we examine Si and Te ion implant damage removal in GaN as a function of implantation dose, and implantation and annealing temperature. Transmission electron microscopy shows that amorphous layers, which can result from high-dose implantation, recrystallize between 800 and 1100{degree}C to very defective polycrystalline material. Lower-dose implants (down to 5{times}10{sup 13}cm{sup {minus}2}), which are not amorphous but defective after implantation, also anneal poorly up to 1100{degree}C, leaving a coarse network of extended defects. Despite such disorder, a high fraction of Te is found to be substitutional in GaN both following implantation and after annealing. Furthermore, although elevated-temperature implants result in less disorder after implantation, this damage is also impossible to anneal out completely by 1100{degree}C. The implications of this study are that considerably higher annealing temperatures will be needed to remove damage for optimum electrical properties. {copyright} {ital 1998 American Institute of Physics.}

  14. Cathodoluminescence characterization of ion implanted GaAs

    NASA Astrophysics Data System (ADS)

    Cone, M. L.

    1980-03-01

    The unique properties of GaAs make it possible to construct integrated circuit devices that are impossible in Si. The Air Force Avionics Laboratory/AADR has been developing this technology for a number of years. The difficulty of introducing dopants by diffusion has lead ion implantation to play an increasing role in the fabrication process. The present production technique for high performance devices is to fabricate large quantities and select those few that meet the desired specifications. Having a nondestructive technique that can be used to characterize the implantation process during fabrication of the device so as to reject faulty device structures can save valuable time as well as money. Depth-resolved cathodoluminescence is a process that can be used for this purpose. This research develops and verifies a model of cathodoluminescence in ion implanted GaAs. This model can now be used as a tool for further study of ion implanted GaAs. This is the first step in developing cathodoluminescence as a tool for deducing the shape of the ion implanted depth profile in semiconductor materials.

  15. Ion implantation of silicon nitride ball bearings

    SciTech Connect

    Williams, J.M.; Miner, J.R.

    1996-09-01

    Hypothesis for ion implantation effect was that stress concentrations reflected into the bulk due to topography such as polishing imperfections, texture in the race, or transferred material, might be reduced due to surface amorphization. 42 control samples were tested to an intended runout period of 60 h. Six ion implanted balls were tested to an extended period of 150 h. Accelerated testing was done in a V groove so that wear was on two narrow wear tracks. Rutherford backscattering, XRPS, profilometry, optical microscopy, nanoindentation hardness, and white light interferometry were used. The balls were implanted with 150-keV C ions at fluence 1.1x10{sup 17}/cm{sup 2}. The samples had preexisting surface defects (C-cracks), so the failure rate of the control group was unacceptable. None of the ion-implanted samples failed in 150 h of testing. Probability of randomly selecting 6 samples from the control group that would perform this well is about 5%, so there is good probability that ion implantation improved performance. Possible reasons are discussed. Wear tracks, microstructure, and impurity content were studied in possible relation to C-cracks.

  16. Silicon solar cells by ion implantation and pulsed energy processing

    NASA Technical Reports Server (NTRS)

    Kirkpatrick, A. R.; Minnucci, J. A.; Shaughnessy, T. S.; Greenwald, A. C.

    1976-01-01

    A new method for fabrication of silicon solar cells is being developed around ion implantation in conjunction with pulsed electron beam techniques to replace conventional furnace processing. Solar cells can be fabricated totally in a vacuum environment at room temperature. Cells with 10% AM0 efficiency have been demonstrated. High efficiency cells and effective automated processing capabilities are anticipated.

  17. Molecular ion sources for low energy semiconductor ion implantation (invited).

    PubMed

    Hershcovitch, A; Gushenets, V I; Seleznev, D N; Bugaev, A S; Dugin, S; Oks, E M; Kulevoy, T V; Alexeyenko, O; Kozlov, A; Kropachev, G N; Kuibeda, R P; Minaev, S; Vizir, A; Yushkov, G Yu

    2016-02-01

    Smaller semiconductors require shallow, low energy ion implantation, resulting space charge effects, which reduced beam currents and production rates. To increase production rates, molecular ions are used. Boron and phosphorous (or arsenic) implantation is needed for P-type and N-type semiconductors, respectively. Carborane, which is the most stable molecular boron ion leaves unacceptable carbon residue on extraction grids. A self-cleaning carborane acid compound (C4H12B10O4) was synthesized and utilized in the ITEP Bernas ion source resulting in large carborane ion output, without carbon residue. Pure gaseous processes are desired to enable rapid switch among ion species. Molecular phosphorous was generated by introducing phosphine in dissociators via 4PH3 = P4 + 6H2; generated molecular phosphorous in a pure gaseous process was then injected into the HCEI Calutron-Bernas ion source, from which P4(+) ion beams were extracted. Results from devices and some additional concepts are described. PMID:26932065

  18. Molecular ion sources for low energy semiconductor ion implantation (invited)

    NASA Astrophysics Data System (ADS)

    Hershcovitch, A.; Gushenets, V. I.; Seleznev, D. N.; Bugaev, A. S.; Dugin, S.; Oks, E. M.; Kulevoy, T. V.; Alexeyenko, O.; Kozlov, A.; Kropachev, G. N.; Kuibeda, R. P.; Minaev, S.; Vizir, A.; Yushkov, G. Yu.

    2016-02-01

    Smaller semiconductors require shallow, low energy ion implantation, resulting space charge effects, which reduced beam currents and production rates. To increase production rates, molecular ions are used. Boron and phosphorous (or arsenic) implantation is needed for P-type and N-type semiconductors, respectively. Carborane, which is the most stable molecular boron ion leaves unacceptable carbon residue on extraction grids. A self-cleaning carborane acid compound (C4H12B10O4) was synthesized and utilized in the ITEP Bernas ion source resulting in large carborane ion output, without carbon residue. Pure gaseous processes are desired to enable rapid switch among ion species. Molecular phosphorous was generated by introducing phosphine in dissociators via 4PH3 = P4 + 6H2; generated molecular phosphorous in a pure gaseous process was then injected into the HCEI Calutron-Bernas ion source, from which P4+ ion beams were extracted. Results from devices and some additional concepts are described.

  19. More-reliable SOS ion implantations

    NASA Technical Reports Server (NTRS)

    Woo, D. S.

    1980-01-01

    Conducting layer prevents static charges from accumulating during implantation of silicon-on-sapphire MOS structures. Either thick conducting film or thinner film transparent to ions is deposited prior to implantation, and gaps are etched in regions to be doped. Grounding path eliminates charge flow that damages film or cracks sapphire wafer. Prevention of charge buildup by simultaneously exposing structure to opposite charges requires equipment modifications less practical and more expensive than deposition of conducting layer.

  20. Plasma immersion ion implantation for silicon processing

    NASA Astrophysics Data System (ADS)

    Yankov, Rossen A.; Mändl, Stephan

    2001-04-01

    Plasma Immersion Ion Implantation (PIII) is a technology which is currently widely investigated as an alternative to conventional beam line implantation for ultrashallow doping beyond the 0.15 m technology. However, there are several other application areas in modern semiconductor processing. In this paper a detailed discussion of the PIII process for semiconductors and of actual as well as future applications is given. Besides the well known advantages of PIII - fast process, implantation of the whole surface, low cost of ownership - several peculiarities - like spread of the implantation energy due to finite rise time or collisions, no mass separation, high secondary electron emission - must be mentioned. However, they can be overcome by adjusting the system and the process parameters. Considering the applications, ultrashallow junction formation by PIII is an established industrial process, whereas SIMOX and Smart-Cut by oxygen and hydrogen implantation are current topics between research and introduction into industry. Further applications of PIII, of which some already are research topics and some are only investigated by conventional ion implantation, include seeding for metal deposition, gettering of metal impurities, etch stop layers and helium implantation for localized lifetime control.

  1. Influence of ion implantation on titanium surfaces for medical applications

    NASA Astrophysics Data System (ADS)

    Krischok, Stefan; Blank, Claudia; Engel, Michael; Gutt, Richard; Ecke, Gernot; Schawohl, Jens; Spieß, Lothar; Schrempel, Frank; Hildebrand, Gerhard; Liefeith, Klaus

    2007-09-01

    The implantation of ions into the near surface layer is a new approach to improve the osseointegration of metallic biomaterials like titanium. Meanwhile it is well known that surface topography and surface physico-chemistry as well as visco-elastic properties influence the cell response after implantation of implants into the human body. To optimize the cell response of titanium, ion implantation techniques have been used to integrate calcium and phosphorus, both elements present in the inorganic bone phase. In this context, the concentration profile of the detected elements and their chemical state have been investigated using X-ray photoelectron spectroscopy and Auger electron spectroscopy depth profiling. Ion implantation leads to strong changes of the chemical composition of the near surface region, which are expected to modify the biofunctionality as observed in previous experiments on the cell response. The co-implantation of calcium and phosphorus samples, which showed best results in the performed tests (biological and physical), leads to a strong modification of the chemical surface composition.

  2. Method For Silicon Surface Texturing Using Ion Implantation

    NASA Astrophysics Data System (ADS)

    Kadakia, Nirag; Naczas, Sebastian; Bakhru, Hassaram; Huang, Mengbing

    2011-06-01

    As the semiconductor industry continues to show more interest in the photovoltaic market, cheaper and readily integrable methods of silicon solar cell production are desired. One of these methods—ion implantation—is well-developed and optimized in all commercial semiconductor fabrication facilities. Here we have developed a silicon surface texturing technique predicated upon the phenomenon of surface blistering of H-implanted silicon, using only ion implantation and thermal annealing. We find that following the H implant with a second, heavier implant markedly enhances the surface blistering, causing large trenches that act as a surface texturing of c-Si. We have found that this method reduces total broadband Si reflectance from 35% to below 5percent;. In addition, we have used Rutherford backscattering/channeling measurements investigate the effect of ion implantation on the crystallinity of the sample. The data suggests that implantation-induced lattice damage is recovered upon annealing, reproducing the original monocrystalline structure in the previously amorphized region, while at the same time retaining the textured surface.

  3. Ion implantation of diamond: Damage, doping, and lift-off

    SciTech Connect

    Parikh, N.R.; McGucken, E.; Swanson, M.L.; Hunn, J.D.; White, C.W.; Zuhr, R.A.

    1993-09-01

    In order to make good quality economical diamond electronic devices, it is essential to grow films and to dope these films to obtain n- and p- type conductivity. This review talk discuss first doping by ion implantation plus annealing of the implantation damage, and second flow to make large area single crystal diamonds. C implantation damage below an estimated Frenkel defect concentration of 7% could be recovered almost completely by annealing at 950C. For a defect concentration between 7 and 10%, a stable damage form of diamond (``green diamond``) was formed by annealing. At still higher damage levels, the diamond graphitized. To introduce p-type doping, we have co-implanted B and C into natural diamond at 77K, followed by annealing up to 1100C. The resulting semiconducting material has electrical properties similar to those of natural B-doped diamond. To create n-type diamond, we have implanted Na{sup +}, P+ and As{sup +} ions and have observed semiconducting behavior. This has been compared with carbon or noble element implantation, in an attempt to isolate the effect of radiation damage. Recently, in order to obtain large area signal crystals, we have developed a novel technique for removing thin layers of diamond from bulk or homoepitaxial films. This method consists of ion implantation, followed by selective etching. High energy (4--5 MeV) implantation of carbon or oxygen ions creates a well-defined layer of damaged diamond buried at a controlled depth. This layer is graphitized and selectivity etched either by heating at 550C in an oxygen ambient or by electrolysis. This process successfully lifts off the diamond plate above the graphite layer. The lift-off method, combined with well-established homoepitaxial growth processes, has potential for fabrication of large area single-crystal diamond sheets.

  4. The ion implantation-induced properties of one-dimensional nanomaterials

    PubMed Central

    2013-01-01

    Nowadays, ion implantation is an extensively used technique for material modification. Using this method, we can tailor the properties of target materials, including morphological, mechanical, electronic, and optical properties. All of these modifications impel nanomaterials to be a more useful application to fabricate more high-performance nanomaterial-based devices. Ion implantation is an accurate and controlled doping method for one-dimensional nanomaterials. In this article, we review recent research on ion implantation-induced effects in one-dimensional nanostructure, such as nanowires, nanotubes, and nanobelts. In addition, the optical property of single cadmium sulfide nanobelt implanted by N+ ions has been researched. PMID:23594476

  5. The ion implantation-induced properties of one-dimensional nanomaterials

    NASA Astrophysics Data System (ADS)

    Li, Wen Qing; Xiao, Xiang Heng; Stepanov, Andrey L.; Dai, Zhi Gao; Wu, Wei; Cai, Guang Xu; Ren, Feng; Jiang, Chang Zhong

    2013-04-01

    Nowadays, ion implantation is an extensively used technique for material modification. Using this method, we can tailor the properties of target materials, including morphological, mechanical, electronic, and optical properties. All of these modifications impel nanomaterials to be a more useful application to fabricate more high-performance nanomaterial-based devices. Ion implantation is an accurate and controlled doping method for one-dimensional nanomaterials. In this article, we review recent research on ion implantation-induced effects in one-dimensional nanostructure, such as nanowires, nanotubes, and nanobelts. In addition, the optical property of single cadmium sulfide nanobelt implanted by N+ ions has been researched.

  6. Burnishing Techniques Strengthen Hip Implants

    NASA Technical Reports Server (NTRS)

    2010-01-01

    In the late 1990s, Lambda Research Inc., of Cincinnati, Ohio, received Small Business Innovation Research (SBIR) awards from Glenn Research Center to demonstrate low plasticity burnishing (LPB) on metal engine components. By producing a thermally stable deep layer of compressive residual stress, LPB significantly strengthened turbine alloys. After Lambda patented the process, the Federal Aviation Administration accepted LPB for repair and alteration of commercial aircraft components, the U.S. Department of Energy found LPB suitable for treating nuclear waste containers at Yucca Mountain. Data from the U.S. Food and Drug Administration confirmed LPB to completely eliminate the occurrence of fretting fatigue failures in modular hip implants.

  7. Ion implantation induced swelling in 6H-SiC

    SciTech Connect

    Nipoti, R.; Albertazzi, E.; Bianconi, M.; Lotti, R.; Lulli, G.; Cervera, M.; Carnera, A.

    1997-06-01

    Ion implantation induced surface expansion (swelling) of 6H-SiC was investigated through the measurement of the step height between implanted and unimplanted areas. The samples were irradiated at room temperature with 500 keV Al{sup +} ions in the dose range 1.25{times}10{sup 14}{endash}3{times}10{sup 15}ionscm{sup {minus}2}. Swelling was related to dose and the area density of ion-induced damage measured by Rutherford backscattering channeling technique. The observed trend is consistent with the hypothesis that the volume expansion of the ion damaged crystal is proportional to the area density of displaced atoms, plus an additional relaxation occurring at the onset of the crystalline to amorphous transition. {copyright} {ital 1997 American Institute of Physics.}

  8. Hybrid quantum circuit with implanted erbium ions

    SciTech Connect

    Probst, S.; Rotzinger, H.; Tkalčec, A.; Kukharchyk, N.; Wieck, A. D.; Wünsch, S.; Siegel, M.; Ustinov, A. V.; Bushev, P. A.

    2014-10-20

    We report on hybrid circuit quantum electrodynamics experiments with focused ion beam implanted Er{sup 3+} ions in Y{sub 2}SiO{sub 5} coupled to an array of superconducting lumped element microwave resonators. The Y{sub 2}SiO{sub 5} crystal is divided into several areas with distinct erbium doping concentrations, each coupled to a separate resonator. The coupling strength is varied from 5 MHz to 18.7 MHz, while the linewidth ranges between 50 MHz and 130 MHz. We confirm the paramagnetic properties of the implanted spin ensemble by evaluating the temperature dependence of the coupling. The efficiency of the implantation process is analyzed and the results are compared to a bulk doped Er:Y{sub 2}SiO{sub 5} sample. We demonstrate the integration of these engineered erbium spin ensembles with superconducting circuits.

  9. Corrosion resistance of titanium ion implanted AZ91 magnesium alloy

    SciTech Connect

    Liu Chenglong; Xin Yunchang; Tian Xiubo; Zhao, J.; Chu, Paul K.

    2007-03-15

    Degradable metal alloys constitute a new class of materials for load-bearing biomedical implants. Owing to their good mechanical properties and biocompatibility, magnesium alloys are promising in degradable prosthetic implants. The objective of this study is to improve the corrosion behavior of surgical AZ91 magnesium alloy by titanium ion implantation. The surface characteristics of the ion implanted layer in the magnesium alloys are examined. The authors' results disclose that an intermixed layer is produced and the surface oxidized films are mainly composed of titanium oxide with a lesser amount of magnesium oxide. X-ray photoelectron spectroscopy reveals that the oxide has three layers. The outer layer which is 10 nm thick is mainly composed of MgO and TiO{sub 2} with some Mg(OH){sub 2}. The middle layer that is 50 nm thick comprises predominantly TiO{sub 2} and MgO with minor contributions from MgAl{sub 2}O{sub 4} and TiO. The third layer from the surface is rich in metallic Mg, Ti, Al, and Ti{sub 3}Al. The effects of Ti ion implantation on the corrosion resistance and electrochemical behavior of the magnesium alloys are investigated in simulated body fluids at 37{+-}1 deg. C using electrochemical impedance spectroscopy and open circuit potential techniques. Compared to the unimplanted AZ91 alloy, titanium ion implantation significantly shifts the open circuit potential (OCP) to a more positive potential and improves the corrosion resistance at OCP. This phenomenon can be ascribed to the more compact surface oxide film, enhanced reoxidation on the implanted surface, as well as the increased {beta}-Mg{sub 12}Al{sub 17} phase.

  10. Ion implantation of solar cell junctions without mass analysis

    NASA Technical Reports Server (NTRS)

    Fitzgerald, D.; Tonn, D. G.

    1981-01-01

    This paper is a summary of an investigation to determine the feasibility of producing solar cells by means of ion implantation without the use of mass analysis. Ion implants were performed using molecular and atomic phosphorus produced by the vaporization of solid red phosphorus and ionized in an electron bombardment source. Solar cell junctions were ion implanted by mass analysis of individual molecular species and by direct unanalyzed implants from the ion source. The implant dose ranged from 10 to the 14th to 10 to the 16th atoms/sq cm and the energy per implanted atom ranged from 5 KeV to 40 KeV in this study.

  11. Ion implantation and annealing studies in III-V nitrides

    SciTech Connect

    Zolper, J.C.; Pearton, S.J.; Williams, J.S.; Tan, H.H.; Karlicek, R.J. Jr.; Stall, R.A.

    1996-12-31

    Ion implantation doping and isolation is expected to play an enabling role for the realization of advanced III-Nitride based devices. In fact, implantation has already been used to demonstrate n- and p-type doping of GaN with Si and Mg or Ca, respectively, as well as to fabricate the first GaN junction field effect transistor. Although these initial implantation studies demonstrated the feasibility of this technique for the III-Nitride materials, further work is needed to realize its full potential. After reviewing some of the initial studies in this field, the authors present new results for improved annealing sequences and defect studies in GaN. First, sputtered AlN is shown by electrical characterization of Schottky and Ohmic contacts to be an effect encapsulant of GaN during the 1,100 C implant activation anneal. The AlN suppresses N-loss from the GaN surface and the formation of a degenerate n{sup +}-surface region that would prohibit Schottky barrier formation after the implant activation anneal. Second, they examine the nature of the defect generation and annealing sequence following implantation using both Rutherford Backscattering (RBS) and Hall characterization. They show that for a Si-dose of 1 x 10{sup 16} cm{sup {minus}2} 50% electrical donor activation is achieved despite a significant amount of residual implantation-induced damage in the material.

  12. Ion beam sputter modification of the surface morphology of biological implants

    NASA Technical Reports Server (NTRS)

    Weigand, A. J.; Banks, B. A.

    1976-01-01

    The surface chemistry and texture of materials used for biological implants may significantly influence their performance and biocompatibility. Recent interest in the microscopic control of implant surface texture has led to the evaluation of ion beam sputtering as a potentially useful surface roughening technique. Ion sources, similar to electron bombardment ion thrusters designed for propulsive applications, are used to roughen the surfaces of various biocompatible alloys or polymer materials. These materials are typically used for dental implants, orthopedic prostheses, vascular prostheses, and artificial heart components. Masking techniques and resulting surface textures are described along with progress concerning evaluation of the biological response to the ion beam sputtered surfaces.

  13. Ion-beam-sputter modification of the surface morphology of biological implants

    NASA Technical Reports Server (NTRS)

    Weigand, A. J.; Banks, B. A.

    1977-01-01

    The surface chemistry and texture of materials used for biological implants may significantly influence their performance and biocompatibility. Recent interest in the microscopic control of implant surface texture has led to the evaluation of ion-beam sputtering as a potentially useful surface roughening technique. Ion sources, similar to electron-bombardment ion thrusters designed for propulsive applications, are used to roughen the surfaces of various biocompatible alloys or polymer materials. These materials are typically used for dental implants, orthopedic prostheses, vascular prostheses, and artificial heart components. Masking techniques and resulting surface textures are described along with progress concerning evaluation of the biological response to the ion-beam-sputtered surfaces.

  14. Method for ion implantation induced embedded particle formation via reduction

    DOEpatents

    Hampikian, Janet M; Hunt, Eden M

    2001-01-01

    A method for ion implantation induced embedded particle formation via reduction with the steps of ion implantation with an ion/element that will chemically reduce the chosen substrate material, implantation of the ion/element to a sufficient concentration and at a sufficient energy for particle formation, and control of the temperature of the substrate during implantation. A preferred embodiment includes the formation of particles which are nano-dimensional (<100 m-n in size). The phase of the particles may be affected by control of the substrate temperature during and/or after the ion implantation process.

  15. Improved ion implant fluence uniformity in hydrogen enhanced glow discharge plasma immersion ion implantation into silicon.

    PubMed

    Luo, J; Li, L H; Liu, H T; Yu, K M; Xu, Y; Zuo, X J; Zhu, P Z; Ma, Y F; Fu, Ricky K Y; Chu, Paul K

    2014-06-01

    Enhanced glow discharge plasma immersion ion implantation does not require an external plasma source but ion focusing affects the lateral ion fluence uniformity, thereby hampering its use in high-fluence hydrogen ion implantation for thin film transfer and fabrication of silicon-on-insulator. Insertion of a metal ring between the sample stage and glass chamber improves the ion uniformity and reduces the ion fluence non-uniformity as the cathode voltage is raised. Two-dimensional multiple-grid particle-in-cell simulation confirms that the variation of electric field inside the chamber leads to mitigation of the ion focusing phenomenon and the results are corroborated experimentally by hydrogen forward scattering. PMID:24985818

  16. Improved ion implant fluence uniformity in hydrogen enhanced glow discharge plasma immersion ion implantation into silicon

    NASA Astrophysics Data System (ADS)

    Luo, J.; Li, L. H.; Liu, H. T.; Yu, K. M.; Xu, Y.; Zuo, X. J.; Zhu, P. Z.; Ma, Y. F.; Fu, Ricky K. Y.; Chu, Paul K.

    2014-06-01

    Enhanced glow discharge plasma immersion ion implantation does not require an external plasma source but ion focusing affects the lateral ion fluence uniformity, thereby hampering its use in high-fluence hydrogen ion implantation for thin film transfer and fabrication of silicon-on-insulator. Insertion of a metal ring between the sample stage and glass chamber improves the ion uniformity and reduces the ion fluence non-uniformity as the cathode voltage is raised. Two-dimensional multiple-grid particle-in-cell simulation confirms that the variation of electric field inside the chamber leads to mitigation of the ion focusing phenomenon and the results are corroborated experimentally by hydrogen forward scattering.

  17. Improved ion implant fluence uniformity in hydrogen enhanced glow discharge plasma immersion ion implantation into silicon

    SciTech Connect

    Luo, J.; Li, L. H. E-mail: paul.chu@cityu.edu.hk; Liu, H. T.; Xu, Y.; Zuo, X. J.; Zhu, P. Z.; Ma, Y. F.; Yu, K. M.; Fu, Ricky K. Y.; Chu, Paul K. E-mail: paul.chu@cityu.edu.hk

    2014-06-15

    Enhanced glow discharge plasma immersion ion implantation does not require an external plasma source but ion focusing affects the lateral ion fluence uniformity, thereby hampering its use in high-fluence hydrogen ion implantation for thin film transfer and fabrication of silicon-on-insulator. Insertion of a metal ring between the sample stage and glass chamber improves the ion uniformity and reduces the ion fluence non-uniformity as the cathode voltage is raised. Two-dimensional multiple-grid particle-in-cell simulation confirms that the variation of electric field inside the chamber leads to mitigation of the ion focusing phenomenon and the results are corroborated experimentally by hydrogen forward scattering.

  18. Rhenium ion beam for implantation into semiconductors

    SciTech Connect

    Kulevoy, T. V.; Seleznev, D. N.; Alyoshin, M. E.; Kraevsky, S. V.; Yakushin, P. E.; Khoroshilov, V. V.; Gerasimenko, N. N.; Smirnov, D. I.; Fedorov, P. A.; Temirov, A. A.

    2012-02-15

    At the ion source test bench in Institute for Theoretical and Experimental Physics the program of ion source development for semiconductor industry is in progress. In framework of the program the Metal Vapor Vacuum Arc ion source for germanium and rhenium ion beam generation was developed and investigated. It was shown that at special conditions of ion beam implantation it is possible to fabricate not only homogenous layers of rhenium silicides solid solutions but also clusters of this compound with properties of quantum dots. At the present moment the compound is very interesting for semiconductor industry, especially for nanoelectronics and nanophotonics, but there is no very developed technology for production of nanostructures (for example quantum sized structures) with required parameters. The results of materials synthesis and exploration are presented.

  19. Accelerating degradation rate of pure iron by zinc ion implantation.

    PubMed

    Huang, Tao; Zheng, Yufeng; Han, Yong

    2016-12-01

    Pure iron has been considered as a promising candidate for biodegradable implant applications. However, a faster degradation rate of pure iron is needed to meet the clinical requirement. In this work, metal vapor vacuum arc technology was adopted to implant zinc ions into the surface of pure iron. Results showed that the implantation depth of zinc ions was about 60 nm. The degradation rate of pure iron was found to be accelerated after zinc ion implantation. The cytotoxicity tests revealed that the implanted zinc ions brought a slight increase on cytotoxicity of the tested cells. In terms of hemocompatibility, the hemolysis of zinc ion implanted pure iron was lower than 2%. However, zinc ions might induce more adhered and activated platelets on the surface of pure iron. Overall, zinc ion implantation can be a feasible way to accelerate the degradation rate of pure iron for biodegradable applications. PMID:27482462

  20. Accelerating degradation rate of pure iron by zinc ion implantation

    PubMed Central

    Huang, Tao; Zheng, Yufeng; Han, Yong

    2016-01-01

    Pure iron has been considered as a promising candidate for biodegradable implant applications. However, a faster degradation rate of pure iron is needed to meet the clinical requirement. In this work, metal vapor vacuum arc technology was adopted to implant zinc ions into the surface of pure iron. Results showed that the implantation depth of zinc ions was about 60 nm. The degradation rate of pure iron was found to be accelerated after zinc ion implantation. The cytotoxicity tests revealed that the implanted zinc ions brought a slight increase on cytotoxicity of the tested cells. In terms of hemocompatibility, the hemolysis of zinc ion implanted pure iron was lower than 2%. However, zinc ions might induce more adhered and activated platelets on the surface of pure iron. Overall, zinc ion implantation can be a feasible way to accelerate the degradation rate of pure iron for biodegradable applications. PMID:27482462

  1. Plasma immersion ion implantation for reducing metal ion release

    SciTech Connect

    Diaz, C.; Garcia, J. A.; Maendl, S.; Pereiro, R.; Fernandez, B.; Rodriguez, R. J.

    2012-11-06

    Plasma immersion ion implantation of Nitrogen and Oxygen on CoCrMo alloys was carried out to improve the tribological and corrosion behaviors of these biomedical alloys. In order to optimize the implantation results we were carried experiments at different temperatures. Tribocorrosion tests in bovine serum were used to measure Co, Cr and Mo releasing by using Inductively Coupled Plasma Mass Spectrometry analysis after tests. Also, X-ray Diffraction analysis were employed in order to explain any obtained difference in wear rate and corrosion tests. Wear tests reveals important decreases in rate of more than one order of magnitude for the best treatment. Moreover decreases in metal release were found for all the implanted samples, preserving the same corrosion resistance of the unimplanted samples. Finally this paper gathers an analysis, in terms of implantation parameters and achieved properties for industrial implementation of these treatments.

  2. Enhanced life ion source for germanium and carbon ion implantation

    SciTech Connect

    Hsieh, Tseh-Jen; Colvin, Neil; Kondratenko, Serguei

    2012-11-06

    Germanium and carbon ions represent a significant portion of total ion implantation steps in the process flow. Very often ion source materials that used to produce ions are chemically aggressive, especially at higher temperatures, and result in fast ion source performance degradation and a very limited lifetime [B.S. Freer, et. al., 2002 14th Intl. Conf. on Ion Implantation Technology Proc, IEEE Conf. Proc., p. 420 (2003)]. GeF{sub 4} and CO{sub 2} are commonly used to generate germanium and carbon beams. In the case of GeF{sub 4} controlling the tungsten deposition due to the de-composition of WF{sub 6} (halogen cycle) is critical to ion source life. With CO{sub 2}, the materials oxidation and carbon deposition must be controlled as both will affect cathode thermionic emission and anti-cathode (repeller) efficiencies due to the formation of volatile metal oxides. The improved ion source design Extended Life Source 3 (Eterna ELS3) together with its proprietary co-gas material implementation has demonstrated >300 hours of stable continuous operation when using carbon and germanium ion beams. Optimizing cogas chemistries retard the cathode erosion rate for germanium and carbon minimizes the adverse effects of oxygen when reducing gas is introduced for carbon. The proprietary combination of hardware and co-gas has improved source stability and the results of the hardware and co-gas development are discussed.

  3. Highly antibacterial UHMWPE surfaces by implantation of titanium ions

    NASA Astrophysics Data System (ADS)

    Delle Side, D.; Nassisi, V.; Giuffreda, E.; Velardi, L.; Alifano, P.; Talà, A.; Tredici, S. M.

    2014-07-01

    The spreading of pathogens represents a serious threat for human beings. Consequently, efficient antimicrobial surfaces are needed in order to reduce risks of contracting severe diseases. In this work we present the first evidences of a new technique to obtain a highly antibacterial Ultra High Molecular Weight Polyethylene (UHMWPE) based on a non-stoichiometric titanium oxide coating, visible-light responsive, obtained through ion implantation.

  4. Erbium ion implantation into different crystallographic cuts of lithium niobate

    NASA Astrophysics Data System (ADS)

    Nekvindova, P.; Svecova, B.; Cajzl, J.; Mackova, A.; Malinsky, P.; Oswald, J.; Kolistsch, A.; Spirkova, J.

    2012-02-01

    Single crystals like lithium niobate are frequently doped with optically active rare-earth or transition-metal ions for a variety of applications in optical devices such as solid-state lasers, amplifiers or sensors. To exploit the potential of the Er:LiNbO 3, one must ensure high intensity of the 1.5 μm luminescence as an inevitable prerequisite. One of the important factors influencing the luminescence properties of a lasing ion is the crystal field of the surrounding, which is inevitably determined by the crystal structure of the pertinent material. From that point it is clear that it cannot be easy to affect the resulting luminescence properties - intensity or position of the luminescence band - without changing the structure of the substrate. However, there is a possibility to utilise a potential of the ion implantation of the lasing ions, optionally accompanied with a sensitising one, that can, besides the doping, also modify the structure of the treated area od the crystal. This effect can be eventually enhanced by a post-implantation annealing that may help to recover the damaged structure and hence to improve the desired luminescence. In this paper we are going to report on our experiments with ion-implantation technique followed with subsequent annealing could be a useful way to influence the crystal field of LN. Optically active Er:LiNbO 3 layers were fabricated by medium energy implantation under various experimental conditions. The Er + ions were implanted at energies of 330 and 500 keV with fluences ranging from 1.0 × 10 15 to 1.0 × 10 16 ion cm -2 into LiNbO 3 single-crystal cuts of both common and special orientations. The as-implanted samples were annealed in air and oxygen at two different temperatures (350 and 600 °C) for 5 h. The depth concentration profiles of the implanted erbium were measured by Rutherford Backscattering Spectroscopy (RBS) using 2 MeV He + ions. The photoluminescence spectra of the samples were measured to determine the

  5. Why are mini-implants lost: The value of the implantation technique!

    PubMed Central

    Romano, Fabio Lourenço; Consolaro, Alberto

    2015-01-01

    The use of mini-implants have made a major contribution to orthodontic treatment. Demand has aroused scientific curiosity about implant placement procedures and techniques. However, the reasons for instability have not yet been made totally clear. The aim of this article is to establish a relationship between implant placement technique and mini-implant success rates by means of examining the following hypotheses: 1) Sites of poor alveolar bone and little space between roots lead to inadequate implant placement; 2) Different sites require mini-implants of different sizes! Implant size should respect alveolar bone diameter; 3) Properly determining mini-implant placement site provides ease for implant placement and contributes to stability; 4) The more precise the lancing procedures, the better the implant placement technique; 5) Self-drilling does not mean higher pressures; 6) Knowing where implant placement should end decreases the risk of complications and mini-implant loss. PMID:25741821

  6. Molecular Ion Beam Transportation for Low Energy Ion Implantation

    SciTech Connect

    Kulevoy, T. V.; Kropachev, G. N.; Seleznev, D. N.; Yakushin, P. E.; Kuibeda, R. P.; Kozlov, A. V.; Koshelev, V. A.; Hershcovitch, A.; Johnson, B. M.; Gushenets, V. I.; Oks, E. M.; Polozov, S. M.; Poole, H. J.

    2011-01-07

    A joint research and development of steady state intense boron ion sources for 100's of electron-volt ion implanters has been in progress for the past five years. Current density limitation associated with extracting and transporting low energy ion beams result in lower beam currents that in turn adversely affects the process throughput. The transport channel with electrostatic lenses for decaborane (B{sub 10}H{sub 14}) and carborane (C{sub 2}B{sub 10}H{sub 12}) ion beams transportation was developed and investigated. The significant increase of ion beam intensity at the beam transport channel output is demonstrated. The transport channel simulation, construction and experimental results of ion beam transportation are presented.

  7. Development of a microwave ion source for ion implantations.

    PubMed

    Takahashi, N; Murata, H; Kitami, H; Mitsubori, H; Sakuraba, J; Soga, T; Aoki, Y; Katoh, T

    2016-02-01

    A microwave ion source is expected to have a long lifetime, as it has fewer consumables. Thus, we are in the process of developing a microwave ion source for ion implantation applications. In this paper, we report on a newly developed plasma chamber and the extracted P(+) beam currents. The volume of the plasma chamber is optimized by varying the length of a boron nitride block installed within the chamber. The extracted P(+) beam current is more than 30 mA, at a 25 kV acceleration voltage, using PH3 gas. PMID:26932118

  8. Development of a microwave ion source for ion implantations

    NASA Astrophysics Data System (ADS)

    Takahashi, N.; Murata, H.; Kitami, H.; Mitsubori, H.; Sakuraba, J.; Soga, T.; Aoki, Y.; Katoh, T.

    2016-02-01

    A microwave ion source is expected to have a long lifetime, as it has fewer consumables. Thus, we are in the process of developing a microwave ion source for ion implantation applications. In this paper, we report on a newly developed plasma chamber and the extracted P+ beam currents. The volume of the plasma chamber is optimized by varying the length of a boron nitride block installed within the chamber. The extracted P+ beam current is more than 30 mA, at a 25 kV acceleration voltage, using PH3 gas.

  9. Characterization of silicon-gate CMOS/SOS integrated circuits processed with ion implantation

    NASA Technical Reports Server (NTRS)

    Woo, D. S.

    1977-01-01

    Progress in developing the application of ion implantation techniques to silicon gate CMOS/SOS processing is described. All of the conventional doping techniques such as in situ doping of the epi-film and diffusion by means of doped oxides are replaced by ion implantation. Various devices and process parameters are characterized to generate an optimum process by the use of an existing SOS test array. As a result, excellent circuit performance is achieved. A general description of the all ion implantation process is presented.

  10. FIM/IAP/TEM studies of ion implanted nickel emitters

    SciTech Connect

    Walck, S.D.; Hren, J.J.

    1985-01-01

    Accurate depth profiling of implanted hydrogen and its isotopes in metals is extremely important. Field ion microscopy and atom-probe techniques provide the most accurate depth profiling analytical method of any available. In addition, they are extremely sensitive to hydrogen. This paper reports our early work on hydrogen trapping at defects in metals using the Field Ion Microscope/Imaging Atom Probe (FIM/IAP). Our results deal primarily with the control experiments required to overcome instrumental difficulties associated with in situ implantation and the influence of a high electric field. Transmission Electron Microscopy (TEM) has been used extensively to independently examine the influence of high electric fields on emitters. 11 references, 7 figures.

  11. Biodegradable radioactive implants for glaucoma filtering surgery produced by ion implantation

    NASA Astrophysics Data System (ADS)

    Assmann, W.; Schubert, M.; Held, A.; Pichler, A.; Chill, A.; Kiermaier, S.; Schlösser, K.; Busch, H.; Schenk, K.; Streufert, D.; Lanzl, I.

    2007-04-01

    A biodegradable, β-emitting implant has been developed and successfully tested which prevents fresh intraocular pressure increase after glaucoma filtering surgery. Ion implantation has been used to load the polymeric implants with the β-emitter 32P. The influence of ion implantation and gamma sterilisation on degradation and 32P-fixation behavior has been studied by ion beam and chemical analysis. Irradiation effects due to the applied ion fluence (1015 ions/cm2) and gamma dose (25 kGy) are found to be tolerable.

  12. Simulation of ion beam transport through the 400 Kv ion implanter at Michigan Ion Beam Laboratory

    SciTech Connect

    Naab, F. U.; Toader, O. F.; Was, G. S.

    2013-04-19

    The Michigan Ion Beam Laboratory houses a 400 kV ion implanter. An application that simulates the ion beam trajectories through the implanter from the ion source to the target was developed using the SIMION Registered-Sign code. The goals were to have a tool to develop an intuitive understanding of abstract physics phenomena and diagnose ion trajectories. Using this application, new implanter users of different fields in science quickly understand how the machine works and quickly learn to operate it. In this article we describe the implanter simulation application and compare the parameters of the implanter components obtained from the simulations with the measured ones. The overall agreement between the simulated and measured values of magnetic fields and electric potentials is {approx}10%.

  13. Carbon, nitrogen, and oxygen ion implantation of stainless steel

    SciTech Connect

    Rej, D.J.; Gavrilov, N.V.; Emlin, D.

    1995-12-31

    Ion implantation experiments of C, N, and O into stainless steel have been performed, with beam-line and plasma source ion implantation methods. Acceleration voltages were varied between 27 and 50 kV, with pulsed ion current densities between 1 and 10 mA/cm{sup 2}. Implanted doses ranged from 0.5 to 3 {times} 10{sup 18}cm{sup -2}, while workpiece temperatures were maintained between 25 and 800 C. Implant concentration profiles, microstructure, and surface mechanical properties of the implanted materials are reported.

  14. Computational stochastic model of ions implantation

    SciTech Connect

    Zmievskaya, Galina I. Bondareva, Anna L.; Levchenko, Tatiana V.; Maino, Giuseppe

    2015-03-10

    Implantation flux ions into crystal leads to phase transition /PT/ 1-st kind. Damaging lattice is associated with processes clustering vacancies and gaseous bubbles as well their brownian motion. System of stochastic differential equations /SDEs/ Ito for evolution stochastic dynamical variables corresponds to the superposition Wiener processes. The kinetic equations in partial derivatives /KE/, Kolmogorov-Feller and Einstein-Smolukhovskii, were formulated for nucleation into lattice of weakly soluble gases. According theory, coefficients of stochastic and kinetic equations uniquely related. Radiation stimulated phase transition are characterized by kinetic distribution functions /DFs/ of implanted clusters versus their sizes and depth of gas penetration into lattice. Macroscopic parameters of kinetics such as the porosity and stress calculated in thin layers metal/dielectric due to Xe{sup ++} irradiation are attracted as example. Predictions of porosity, important for validation accumulation stresses in surfaces, can be applied at restoring of objects the cultural heritage.

  15. Surface stiffening and enhanced photoluminescence of ion implanted cellulose - polyvinyl alcohol - silica composite.

    PubMed

    Shanthini, G M; Sakthivel, N; Menon, Ranjini; Nabhiraj, P Y; Gómez-Tejedor, J A; Meseguer-Dueñas, J M; Gómez Ribelles, J L; Krishna, J B M; Kalkura, S Narayana

    2016-11-20

    Novel Cellulose (Cel) reinforced polyvinyl alcohol (PVA)-Silica (Si) composite which has good stability and in vitro degradation was prepared by lyophilization technique and implanted using N(3+) ions of energy 24keV in the fluences of 1×10(15), 5×10(15) and 1×10(16)ions/cm(2). SEM analysis revealed the formation of microstructures, and improved the surface roughness on ion implantation. In addition to these structural changes, the implantation significantly modified the luminescent, thermal and mechanical properties of the samples. The elastic modulus of the implanted samples has increased by about 50 times compared to the pristine which confirms that the stiffness of the sample surface has increased remarkably on ion implantation. The photoluminescence of the native cellulose has improved greatly due to defect site, dangling bonds and hydrogen passivation. Electric conductivity of the ion implanted samples was improved by about 25%. Hence, low energy ion implantation tunes the mechanical property, surface roughness and further induces the formation of nano structures. MG63 cells seeded onto the scaffolds reveals that with the increase in implantation fluence, the cell attachment, viability and proliferation have improved greatly compared to pristine. The enhancement of cell growth of about 59% was observed in the implanted samples compared to pristine. These properties will enable the scaffolds to be ideal for bone tissue engineering and imaging applications. PMID:27561534

  16. Cochlear implant simulator for surgical technique analysis

    NASA Astrophysics Data System (ADS)

    Turok, Rebecca L.; Labadie, Robert F.; Wanna, George B.; Dawant, Benoit M.; Noble, Jack H.

    2014-03-01

    Cochlear Implant (CI) surgery is a procedure in which an electrode array is inserted into the cochlea. The electrode array is used to stimulate auditory nerve fibers and restore hearing for people with severe to profound hearing loss. The primary goals when placing the electrode array are to fully insert the array into the cochlea while minimizing trauma to the cochlea. Studying the relationship between surgical outcome and various surgical techniques has been difficult since trauma and electrode placement are generally unknown without histology. Our group has created a CI placement simulator that combines an interactive 3D visualization environment with a haptic-feedback-enabled controller. Surgical techniques and patient anatomy can be varied between simulations so that outcomes can be studied under varied conditions. With this system, we envision that through numerous trials we will be able to statistically analyze how outcomes relate to surgical techniques. As a first test of this system, in this work, we have designed an experiment in which we compare the spatial distribution of forces imparted to the cochlea in the array insertion procedure when using two different but commonly used surgical techniques for cochlear access, called round window and cochleostomy access. Our results suggest that CIs implanted using round window access may cause less trauma to deeper intracochlear structures than cochleostomy techniques. This result is of interest because it challenges traditional thinking in the otological community but might offer an explanation for recent anecdotal evidence that suggests that round window access techniques lead to better outcomes.

  17. Oxidation of ion-implanted NiAl

    SciTech Connect

    Hanrahan, R.J. Jr.; Verink, E.D. Jr.; Withrow, S.P.

    1994-12-31

    The oxidation of NiAl is complicated by the formation of transient alumina phases which result in convoluted scales which are prone to spallation. We have investigated high-dose implantation of oxygen as a technique for forming a protective oxide layer on the surface of NiAl and thereby bypassing the conditions that lead to transient oxide formation. Single crystal specimens of high purity NiAl were implanted with 1 {times} 10{sup 18} {sup 18}O ions/cm{sup 2} at 160 keV. Implanted specimens were annealed for times ranging from 5 to 60 minutes in a reducing atmosphere. Oxidation experiments were conducted for periods ranging from 1 hour to 42 hours under both cyclic and isothermal conditions. Specimens in the as-implanted, annealed, and oxidized conditions were examined using Auger electron microscopy. Oxygen implantation followed by annealing was found to form an epitaxial oxide layer. This layer is stable for the duration of the oxidation experiments conducted in this study, and was found to result in reduced oxidation and improved resistance to scale spallation.

  18. The Optical Properties of Ion Implanted Silica

    NASA Technical Reports Server (NTRS)

    Smith, Cydale C.; Ila, D.; Sarkisov, S.; Williams, E. K.; Poker, D. B.; Hensley, D. K.

    1997-01-01

    We will present our investigation on the change in the optical properties of silica, 'suprasil', after keV through MeV implantation of copper, tin, silver and gold and after annealing. Suprasil-1, name brand of silica glass produced by Hereaus Amerisil, which is chemically pure with well known optical properties. Both linear nonlinear optical properties of the implanted silica were investigated before and after thermal annealing. All implants, except for Sn, showed strong optical absorption bands in agreement with Mie's theory. We have also used Z-scan to measure the strength of the third order nonlinear optical properties of the produced thin films, which is composed of the host material and the metallic nanoclusters. For implants with a measurable optical absorption band we used Doyle's theory and the full width half maximum of the absorption band to calculate the predicted size of the formed nanoclusters at various heat treatment temperatures. These results are compared with those obtained from direct observation using transmission electron microscopic techniques.

  19. Low-cost ion implantation and annealing technology for solar cells

    NASA Technical Reports Server (NTRS)

    Kirkpatrick, A. H.; Minnucci, J. A.; Greenwald, A. C.

    1980-01-01

    Ion implantation and thermal annealing techniques for processing junctions and back surface layers in solar cells are discussed. Standard 10 keV (31)p(+) junction implants and 25 keV (11)B(+) back surface implants in combination with three-step furnace annealing are used for processing a range of silicon materials and device structures. Cells with efficiencies up to 16.5% AM1 are being produced, and large-area terrestrial cells with implanted junctions and back fields being fabricated in pilot production exhibit average efficiencies in excess of 15% AM1. Thermal annealing methods for removal of the radiation damage caused by implantation should be replaced by transient processing techniques in future production. Design studies have been completed for solar cell processing implanters to support 10 MW/yr and 100 MW/yr production lines, and analyses indicate that implantation costs can be reduced to approximately 1 cent/watt.

  20. Oxygen incorporation in polyethylene and polypropylene implanted with F+, As+ and I+ ions at high dose

    NASA Astrophysics Data System (ADS)

    Hnatowicz, V.; Kvítek, J.; Švorčík, V.; Rybka, V.

    1994-04-01

    Samples of PolyPropylene (PP) and PolyEthylene (PE) implanted with 150 keV F+, As+ and I+ ions with a dose of 1×1015 cm-2 were studied using standard Rutherford Back Scattering (RBS) technique. No fluorine atoms above the present RBS detection limit were observed in the ion-implanted polymers. The measured depth profiles of As and I atoms are significantly broader than those predicted by the TRIM code for pristine polymers. The differences can be explained by stepwise polymer degradation due to ion bombardment. Massive oxidation of the ion-implanted polymers is observed. The oxidation rate and the resulting oxygen depth profile depend strongly on the polymer type and implanted ion mass. In the samples implanted with F+ ions, an uniformly oxidized layer is built up with a mean oxygen concentration of 15 at.%. In the samples implanted with As+ and I+ ions, a non-uniform oxygen depth distribution is observed with two concentration maxima on the sample surface and in a depth correlated with implanted ion range.

  1. Ion implantation effects in 'cosmic' dust grains

    NASA Technical Reports Server (NTRS)

    Bibring, J. P.; Langevin, Y.; Maurette, M.; Meunier, R.; Jouffrey, B.; Jouret, C.

    1974-01-01

    Cosmic dust grains, whatever their origin may be, have probably suffered a complex sequence of events including exposure to high doses of low-energy nuclear particles and cycles of turbulent motions. High-voltage electron microscope observations of micron-sized grains either naturally exposed to space environmental parameters on the lunar surface or artificially subjected to space simulated conditions strongly suggest that such events could drastically modify the mineralogical composition of the grains and considerably ease their aggregation during collisions at low speeds. Furthermore, combined mass spectrometer and ionic analyzer studies show that small carbon compounds can be both synthesized during the implantation of a mixture of low-energy D, C, N ions in various solids and released in space by ion sputtering.

  2. Removal of dental implants: review of five different techniques.

    PubMed

    Stajčić, Z; Stojčev Stajčić, L J; Kalanović, M; Đinić, A; Divekar, N; Rodić, M

    2016-05-01

    The aims of this study were to review five different explantation techniques for the removal of failing implants and to propose a practical clinical protocol. During a 10-year period, 95 implants were explanted from 81 patients. Explantation techniques used were the bur-forceps (BF), neo bur-elevator-forceps (ηBEF), trephine drill (TD), high torque wrench (HTW), and scalpel-forceps (SF) techniques. The following parameters were analyzed: indications for explanation, site of implantation, and the type, diameter, and length of the implant removed. The most frequent indications for implant removal were peri-implantitis (n=37) and crestal bone loss (n=48). The posterior maxilla was the most frequent site of implant removal (n=48). The longer implants were more frequently removed (n=78). The majority of implants were removed after 1 year in function (n=69). The BF/ηBEF and SF techniques were found to be the most efficient. Explantation techniques appeared to be successful for the removal of failing implants. The BF/ηBEF and SF techniques demonstrated 100% success. The ηBEF technique enabled safe insertion of a new implant in the same explantation site. The HTW technique appeared to be the most elegant technique with the highest predictability for insertion of another implant. An explantation protocol is proposed. PMID:26688293

  3. Flame annealing of ion implanted silicon

    SciTech Connect

    Narayan, J.; Young, R.T.

    1983-01-01

    The authors investigated flame annealing of ion implantation damage (consisting of amorphous layers and dislocation loops) in (100) and (111) silicon substrates. The temperature of a hydrogen flame was varied from 1050 to 1200/sup 0/C and the interaction time from 5 to 10 seconds. Detailed TEM results showed that a defect-free annealing of amorphous layers by solid-phase-epitaxial growth could be achieved up to a certain concentration. However, dislocation loops in the region below the amorphous layer exhibited coarsening, i.e., the average loop size increased while the number density of loops decreased. Above a critical loop density, which was found to be a function of ion implantation variables and substrate temperature, formation of 90/sup 0/ dislocations (a cross-grid of dislocation in (100) and a triangular grid in (111) specimens) were observed. Electrical (Van der Pauw) measurements indicated nearly a complete electrical activation of dopants with mobility comparable to pulsed laser annealed specimens. The characteristics of p-n junction diodes showed a good diode perfection factor of 1.20-1.25 and low reverse bias currents.

  4. All-ion-implantation process for integrated circuits

    NASA Technical Reports Server (NTRS)

    Woo, D. S.

    1979-01-01

    Simpler than diffusion fabrication, ion bombardment produces complementary-metal-oxide-semiconductor / silicon-on-sapphire (CMOS/SOS) circuits that are one-third faster. Ion implantation simplifies the integrated circuit fabrication procedure and produces circuits with uniform characteristics.

  5. A novel method for effective sodium ion implantation into silicon

    SciTech Connect

    Lu Qiuyuan; Chu, Paul K.

    2012-07-15

    Although sodium ion implantation is useful to the surface modification of biomaterials and nano-electronic materials, it is a challenging to conduct effective sodium implantation by traditional implantation methods due to its high chemical reactivity. In this paper, we present a novel method by coupling a Na dispenser with plasma immersion ion implantation and radio frequency discharge. X-ray photoelectron spectroscopy (XPS) depth profiling reveals that sodium is effectively implanted into a silicon wafer using this apparatus. The Na 1s XPS spectra disclose Na{sub 2}O-SiO{sub 2} bonds and the implantation effects are confirmed by tapping mode atomic force microscopy. Our setup provides a feasible way to conduct sodium ion implantation effectively.

  6. Mechanical stresses and amorphization of ion-implanted diamond

    NASA Astrophysics Data System (ADS)

    Khmelnitsky, R. A.; Dravin, V. A.; Tal, A. A.; Latushko, M. I.; Khomich, A. A.; Khomich, A. V.; Trushin, A. S.; Alekseev, A. A.; Terentiev, S. A.

    2013-06-01

    Scanning white light interferometry and Raman spectroscopy were used to investigate the mechanical stresses and structural changes in ion-implanted natural diamonds with different impurity content. The uniform distribution of radiation defects in implanted area was obtained by the regime of multiple-energy implantation of keV He+ ions. A modification of Bosia's et al. (Nucl. Instrum. Meth. B 268 (2010) 2991) method for determining the internal stresses and the density variation in an ion-implanted diamond layer was proposed that suggests measuring, in addition to the surface swelling of a diamond plate, the radius of curvature of the plate. It is shown that, under multiple-energy implantation of He+, mechanical stresses in the implanted layer may be as high as 12 GPa. It is shown that radiation damage reaches saturation for the implantation fluence characteristic of amorphization of diamond but is appreciably lower than the graphitization threshold.

  7. Ion beam technology applications study. [ion impact, implantation, and surface finishing

    NASA Technical Reports Server (NTRS)

    Sellen, J. M., Jr.; Zafran, S.; Komatsu, G. K.

    1978-01-01

    Specific perceptions and possible ion beam technology applications were obtained as a result of a literature search and contact interviews with various institutions and individuals which took place over a 5-month period. The use of broad beam electron bombardment ion sources is assessed for materials deposition, removal, and alteration. Special techniques examined include: (1) cleaning, cutting, and texturing for surface treatment; (2) crosslinking of polymers, stress relief in deposited layers, and the creation of defect states in crystalline material by ion impact; and (3) ion implantation during epitaxial growth and the deposition of neutral materials sputtered by the ion beam. The aspects, advantages, and disadvantages of ion beam technology and the competitive role of alternative technologies are discussed.

  8. Optical absorption in ion-implanted lead lanthanum zirconate titanate ceramics

    SciTech Connect

    Seager, C.H.; Land, C.E.

    1984-08-15

    Optical absorption measurements have been performed on unmodified and on ion-implanted lead lanthanum zirconate titanate ceramics using the photothermal deflection spectroscopy technique. Bulk absorption coefficients depend on the average grain size of the material while the absorption associated with the ion-damaged layers does not. The damage-induced surface absorptance correlates well with the photosensitivity observed in implanted PLZT devices, supporting earlier models for the enhanced imaging efficiency of the materials.

  9. INSTRUMENTS AND METHODS OF INVESTIGATION: Impurity ion implantation into silicon single crystals: efficiency and radiation damage

    NASA Astrophysics Data System (ADS)

    Vavilov, V. S.; Chelyadinskii, Aleksei R.

    1995-03-01

    The ion implantation method is analysed from the point of view of its efficiency as a technique for doping silicon with donor and acceptor impurities, for synthesising silicon-based compounds and for producing gettering layers and optoelectronic structures. The introduction, agglomeration, and annealing of radiation-produced defects in ion-implanted silicon are considered. The role of interstitial defects in radiation-related defect formation is estimated. Mechanisms of athermal migration of silicon atoms in the silicon lattice are analysed.

  10. Modeling of nanocluster formation by ion beam implantation

    SciTech Connect

    Li, Kun-Dar

    2011-08-15

    A theoretical model was developed to investigate the mechanism of the formation of nanoclusters via ion beam implantation. The evolution of nanoclusters, including the nucleation and growth process known as Ostwald ripening, was rebuilt using numerical simulations. The effects of implantation parameters such as the ion energy, ion fluence, and temperature on the morphology of implanted microstructures were also studied through integration with the Monte Carlo Transport of Ions in Matter code calculation for the distribution profiles of implanted ions. With an appropriate ion fluence, a labyrinth-like nanostructure with broad size distributions of nanoclusters formed along the ion implantation range. In a latter stage, a buried layer of implanted impurity developed. With decreasing ion energy, the model predicted the formation of precipitates on the surface. These simulation results were fully consistent with many experimental observations. With increased temperature, the characteristic length and size of nanostructures would increase due to the high mobility. This theoretical model provides an efficient numerical approach for fully understanding the mechanism of the formation of nanoclusters, allowing for the design of ion beam experiments to form specific nanostructures through ion-implantation technology.

  11. Ion implantation of highly corrosive electrolyte battery components

    DOEpatents

    Muller, R.H.; Zhang, S.

    1997-01-14

    A method of producing corrosion resistant electrodes and other surfaces in corrosive batteries using ion implantation is described. Solid electrically conductive material is used as the ion implantation source. Battery electrode grids, especially anode grids, can be produced with greatly increased corrosion resistance for use in lead acid, molten salt, and sodium sulfur. 6 figs.

  12. Ion implantation of highly corrosive electrolyte battery components

    DOEpatents

    Muller, Rolf H.; Zhang, Shengtao

    1997-01-01

    A method of producing corrosion resistant electrodes and other surfaces in corrosive batteries using ion implantation is described. Solid electrically conductive material is used as the ion implantation source. Battery electrode grids, especially anode grids, can be produced with greatly increased corrosion resistance for use in lead acid, molten salt, end sodium sulfur.

  13. Comparison between conventional and plasma source ion-implanted femoral knee components

    NASA Astrophysics Data System (ADS)

    Chen, A.; Scheuer, J. T.; Ritter, C.; Alexander, R. B.; Conrad, J. R.

    1991-12-01

    Nitrogen ion implantation of Ti-6Al-4V knee joint femoral components was carried out by both plasma source ion implantation (PSII), a non-line of sight technique, and conventional beamline implantation. Implantation using the PSII process was performed on a flat sample as well as a 2×2 square array of components to demonstrate batch processing capability. The retained dose of the flat sample and at different locations on the implanted components was measured by a scanning auger microprobe (SAM). The variation in dose of the PSII treated component was found to be within the SAM error, while the dose at one location on the beamline implanted component was found to be significantly low. For the beamline case, the SAM results show good agreement with the PC profile computer simulation, which includes the angular dependence of sputtering.

  14. Ion implantation induced blistering of rutile single crystals

    NASA Astrophysics Data System (ADS)

    Xiang, Bing-Xi; Jiao, Yang; Guan, Jing; Wang, Lei

    2015-07-01

    The rutile single crystals were implanted by 200 keV He+ ions with a series fluence and annealed at different temperatures to investigate the blistering behavior. The Rutherford backscattering spectrometry, optical microscope and X-ray diffraction were employed to characterize the implantation induced lattice damage and blistering. It was found that the blistering on rutile surface region can be realized by He+ ion implantation with appropriate fluence and the following thermal annealing.

  15. Ion-Implanted Diamond Films and Their Tribological Properties

    NASA Technical Reports Server (NTRS)

    Wu, Richard L. C.; Miyoshi, Kazuhisa; Korenyi-Both, Andras L.; Garscadden, Alan; Barnes, Paul N.

    1993-01-01

    This paper reports the physical characterization and tribological evaluation of ion-implanted diamond films. Diamond films were produced by microwave plasma, chemical vapor deposition technique. Diamond films with various grain sizes (0.3 and 3 microns) and roughness (9.1 and 92.1 nm r.m.s. respectively) were implanted with C(+) (m/e = 12) at an ion energy of 160 eV and a fluence of 6.72 x 10(exp 17) ions/sq cm. Unidirectional sliding friction experiments were conducted in ultrahigh vacuum (6.6 x 10(exp -7)Pa), dry nitrogen and humid air (40% RH) environments. The effects of C(+) ion bombardment on fine and coarse-grained diamond films are as follows: the surface morphology of the diamond films did not change; the surface roughness increased (16.3 and 135.3 nm r.m.s.); the diamond structures were damaged and formed a thin layer of amorphous non-diamond carbon; the friction coefficients dramatically decreased in the ultrahigh vacuum (0.1 and 0.4); the friction coefficients decreased slightly in the dry nitrogen and humid air environments.

  16. FeN foils by nitrogen ion-implantation

    SciTech Connect

    Jiang, Yanfeng; Wang, Jian-Ping; Al Mehedi, Md; Fu, Engang; Wang, Yongqiang

    2014-05-07

    Iron nitride samples in foil shape (free standing, 500 nm in thickness) were prepared by a nitrogen ion-implantation method. To facilitate phase transformation, the samples were bonded on the substrate followed by a post-annealing step. By using two different substrates, single crystal Si and GaAs, structural and magnetic properties of iron nitride foil samples prepared with different nitrogen ion fluences were characterized. α″-Fe{sub 16}N{sub 2} phase in iron nitride foil samples was obtained and confirmed by the proposed approach. A hard magnetic property with coercivity up to 780 Oe was achieved for the FeN foil samples bonded on Si substrate. The feasibility of using nitrogen ion implantation techniques to prepare FeN foil samples up to 500 nm thickness with a stable martensitic phase under high ion fluences has been demonstrated. A possible mechanism was proposed to explain this result. This proposed method could potentially be an alternative route to prepare rare-earth-free FeN bulk magnets by stacking and pressing multiple free-standing thick α″-Fe{sub 16}N{sub 2} foils together.

  17. Fe-ions implantation to modify TiO2 trilayer films for dye-sensitized solar cells

    NASA Astrophysics Data System (ADS)

    Luo, Jun; Pang, Pan; Liao, Bin; Xianying, Wu; Zhang, Xu

    2016-06-01

    A series of Fe-doped TiO2 trilayer films were prepared successfully by using the ion-implantation technique. The aim of the ion implantation was to enhance charge transfer and to reduce charge recombination. A maximum conversion efficiency of 4.86% was achieved in cells using Fe-ion-implanted electrodes with the illumination of 6×1015 atom/cm2. It is 14.1% higher than that of the cells without ion implantations. The significant improvement in conversion efficiency by Fe-ion implantation could be contributed to the enhancement of dye uptake and charge transfer, as indicated from the incident photon-to-collected electron conversion efficiency and ultraviolet-visible measurements. Furthermore, the implanted Fe-ions introduce impurity levels in the bandgap of TiO2, and this improves the electron injection efficiency from lowest unoccupied molecular orbital of excited N719 into the conduction band of TiO2.

  18. Pulsed-electron-beam annealing of ion-implantation damage

    NASA Technical Reports Server (NTRS)

    Greenwald, A. C.; Kirkpatrick, A. R.; Little, R. G.; Minnucci, J. A.

    1979-01-01

    Short-duration high-intensity pulsed electron beams have been used to anneal ion-implantation damage in silicon and to electrically activate the dopant species. Lattice regrowth and dopant activation were determined using He(+)-4 backscattering, SEM, TEM, and device performance characteristics as diagnostic techniques. The annealing mechanism is believed to be liquid-phase epitaxial regrowth initiating from the substrate. The high-temperature transient pulse produced by the electron beam causes the dopant to diffuse rapidly in the region where the liquid state is achieved.

  19. Formation of vanadium silicide by high dose ion implantation

    NASA Astrophysics Data System (ADS)

    Salvi, V. P.; Narsale, A. M.; Vidwans, S. V.; Rangwala, A. A.; Guzman, L.; Dapor, M.; Giunta, G.; Calliari, L.; Marchetti, F.

    1987-10-01

    The vanadium silicide system has been found to be of increasing interest because one of the silicide phases viz. V 3Si with the A-15 structure is often accompanied by a high temperature superconductivity. We have studied the formation of vanadium silicide layers by high dose ion implantation. 30 keV 51V + ions were implanted at room temperature onto thermally evaporated a-Si films on thermally grown SiO 2 substrates. The samples were annealed in vacuum to study the possible evolution of V-Si phases. Both Seeman-Bohlin X-ray diffraction and Auger/sputter profiling techniques were used to analyse these samples. The observed Auger depth profile of the annealed samples shows a more uniform vanadium distribution as compared to the vanadium distribution in as-implanted samples, along with the changes in the Si L 2,3VV lineshape. The X-ray diffraction results show the formation of V 3Si, V 5Si 3 and VSi 2 phases. After annealing the sample in vacuum, a more ordered growth of V 3Si phase is found to be accompanied by an increase in VSi 2 phase. This has been related to the possible changes ocurring in the a-Si layers due to annealing of the sample.

  20. Osteogenic activity and antibacterial effect of zinc ion implanted titanium.

    PubMed

    Jin, Guodong; Cao, Huiliang; Qiao, Yuqin; Meng, Fanhao; Zhu, Hongqin; Liu, Xuanyong

    2014-05-01

    Titanium (Ti) and its alloys are widely used as orthopedic and dental implants. In this work, zinc (Zn) was implanted into oxalic acid etched titanium using plasma immersion ion implantation technology. Scanning electron microscopy and X-ray photoelectron spectroscopy were used to investigate the surface morphology and composition of Zn-implanted titanium. The results indicate that the depth profile of zinc in Zn-implanted titanium resembles a Gaussian distribution, and zinc exists in the form of ZnO at the surface whereas in the form of metallic Zn in the interior. The Zn-implanted titanium can significantly stimulate proliferation of osteoblastic MC3T3-E1 cells as well as initial adhesion, spreading activity, ALP activity, collagen secretion and extracellular matrix mineralization of the rat mesenchymal stem cells. The Zn-implanted titanium presents partly antibacterial effect on both Escherichia coli and Staphylococcus aureus. The ability of the Zn-implanted titanium to stimulate cell adhesion, proliferation and differentiation as well as the antibacterial effect on E. coli can be improved by increasing implantation time even to 2 h in this work, indicating that the content of zinc implanted in titanium can easily be controlled within the safe concentration using plasma immersion ion implantation technology. The Zn-implanted titanium with excellent osteogenic activity and partly antibacterial effect can serve as useful candidates for orthopedic and dental implants. PMID:24632388

  1. In-situ deposition of sacrificial layers during ion implantation

    SciTech Connect

    Anders, A.; Anders, S.; Brown, I.G.; Yu, K.M.

    1995-02-01

    The retained dose of implanted ions is limited by sputtering. It is known that a sacrificial layer deposited prior to ion implantation can lead to an enhanced retained dose. However, a higher ion energy is required to obtain a similar implantation depth due to the stopping of ions in the sacrificial layer. It is desirable to have a sacrificial layer of only a few monolayers thickness which can be renewed after it has been sputtered away. We explain the concept and describe two examples: (i) metal ion implantation using simultaneously a vacuum arc ion source and filtered vacuum arc plasma sources, and (ii) Metal Plasma Immersion Ion Implantation and Deposition (MePIIID). In MePIIID, the target is immersed in a metal or carbon plasma and a negative, repetitively pulsed bias voltage is applied. Ions are implanted when the bias is applied while the sacrificial layer suffers sputtering. Low-energy thin film deposition - repair of the sacrificial layer -- occurs between bias pulses. No foreign atoms are incorporated into the target since the sacrificial film is made of the same ion species as used in the implantation phase.

  2. Effects of oxygen ion implantation in spray-pyrolyzed ZnO thin films

    NASA Astrophysics Data System (ADS)

    Vijayakumar, K. P.; Ratheesh Kumar, P. M.; Sudha Kartha, C.; Wilson, K. C.; Singh, F.; Nair, K. G. M.; Kashiwaba, Y.

    2006-04-01

    ZnO thin films, prepared using the chemical spray pyrolysis technique, were implanted using 100 keV O+ ions. Both pristine and ion-implanted samples were characterized using X-ray diffraction, optical absorption, electrical resistivity measurements, thermally stimulated current measurements and photoluminescence. Samples retained their crystallinity even after irradiation at a fluence of 1015 ions/cm2. However, at a still higher fluence of 2 × 1016 ions/cm2, the films became totally amorphous. The optical absorption edge remained unaffected by implantation and optical absorption spectra indicated two levels at 460 and 510 nm. These were attributed to defect levels corresponding to zinc vacancies (VZn) and oxygen antisites (OZn), respectively. Pristine samples had a broad photoluminescence emission centred at 517 nm, which was depleted on implantation. In the case of implanted samples, two additional emissions appeared at 425 and 590 nm. These levels were identified as due to zinc vacancies (VZn) and oxygen vacancies (VO), respectively. The electrical resistivity of implanted samples was much higher than that of pristine, while photosensitivity decreased to a very low value on implantation. This can be utilized in semiconductor device technology for interdevice isolation. Hall measurements showed a marked decrease in mobility due to ion implantation, while carrier concentration slightly increased.

  3. Measurement of lattice damage caused by ion-implantation doping of semiconductors.

    NASA Technical Reports Server (NTRS)

    Hunsperger, R. G.; Wolf, E. D.; Shifrin, G. A.; Marsh, O. J.; Jamba, D. M.

    1971-01-01

    Discussion of two new techniques used to measure the lattice damage produced in GaAs by the implantation of 60 keV cadmium ions. In the first method, optical reflection spectra of the ion-implanted samples were measured in the wavelength range from 2000 to 4600 A. The decrease in reflectivity resulting from ion-implantation was used to determine the relative amount of lattice damage as a function of ion dose. The second technique employed the scanning electron microscope. Patterns very similar in appearance to Kikuchi electron diffraction patterns are obtained when the secondary and/or backscattered electron intensity is displayed as a function of the angle of incidence of the electron beam on a single crystal surface. The results of measurements made by both methods are compared with each other and with data obtained by the method of measuring lattice damage by Rutherford scattering of 1 MeV helium ions.

  4. A commercial plasma source ion implantation facility

    SciTech Connect

    Scheuer, J.T.; Adler, R.A.; Horne, W.G.

    1996-10-01

    Empire Hard Chrome has recently installed commercial plasma source ion implantation (PSU) equipment built by North Star Research Corporation. Los Alamos National Laboratory has assisted in this commercialization effort via two Cooperative Research and Development Agreements to develop the plasma source for the equipment and to identify low-risk commercial PSII applications. The PSII system consists of a 1 m x 1 m cylindrical vacuum chamber with a rf plasma source. The pulse modulator is capable of delivering pulses kV and peak currents of 300 A at maximum repetition rate of 400 Hz. thyratron tube to switch a pulse forming network which is tailored to match the dynamic PSII load. In this paper we discuss the PSII system, process facility, and early commercial applications to production tooling.

  5. Dopant profile engineering of advanced Si MOSFET's using ion implantation

    NASA Astrophysics Data System (ADS)

    Stolk, P. A.; Ponomarev, Y. V.; Schmitz, J.; van Brandenburg, A. C. M. C.; Roes, R.; Montree, A. H.; Woerlee, P. H.

    1999-01-01

    Ion implantation has been used to realize non-uniform, steep retrograde (SR) dopant profiles in the active channel region of advanced Si MOSFET's. After defining the transistor configuration, SR profiles were formed by dopant implantation through the polycrystalline Si gate and the gate oxide (through-the-gate, TG, implantation). The steep nature of the as-implanted profile was retained by applying rapid thermal annealing for dopant activation and implantation damage removal. For NMOS transistors, TG implantation of B yields improved transistor performance through increased carrier mobility, reduced junction capacitances, and reduced susceptibility to short-channel effects. Electrical measurements show that the gate oxide quality is not deteriorated by the ion-induced damage, demonstrating that transistor reliability is preserved. For PMOS transistors, TG implantation of P or As leads to unacceptable source/drain junction broadening as a result of transient enhanced dopant diffusion during thermal activation.

  6. Plasma immersion ion implantation for sub-22 nm node devices: FD-SOI and Tri-Gate

    SciTech Connect

    Duchaine, J.; Milesi, F.; Coquand, R.; Barraud, S.; Reboh, S.; Gonzatti, F.; Mazen, F.; Torregrosa, Frank

    2012-11-06

    Here, we present and discuss the electrical characteristics of fully depleted MOSFET transistors of planar and tridimensional architecture, doped by Plasma Immersion Ion Implantation (PIII) or Beam Line Ion Implantation (BLII). Both techniques delivered similar and satisfactory results in considering the planar architecture. For tri-dimensional Tri-Gate transistors, the results obtained with PIII are superior.

  7. Characterization of high energy ion implantation into Ti-6Al-4V

    NASA Astrophysics Data System (ADS)

    Carroll, M. P.; Stephenson, K.; Findley, K. O.

    2009-06-01

    Ion implantation is a surface modification process that can improve the wear, fatigue, and corrosion resistance for several metals and alloys. Much of the research to date has focused on ion energies less than 1 MeV. With this in mind, Ti-6Al-4V was implanted with Al 2+, Au 3+, and N + ions at energies of 1.5 and 5 MeV and various doses to determine the effects on strengthening of a high energy beam. A post heat treatment on the specimens implanted with Al 2+ samples was conducted to precipitate Ti xAl type intermetallics near the surface. Novel techniques, such as nanoindentation, are available now to determine structure-mechanical property relationships in near-surface regions of the implanted samples. Thus, nanoindentation was performed on pre-implanted, as-implanted, and post heat treated samples to detect differences in elastic modulus and hardness at the sub-micron scale. In addition, sliding wear tests were performed to qualitatively determine the changes in wear performance. The effect of this processing was significant for samples implanted with Al 2+ ions at 1.5 MeV with a dose higher than 1 × 10 16 ions/cm 2 where precipitation hardening likely occurs and with N + ions.

  8. Modification of sol-gel coatings by ion implantation

    NASA Astrophysics Data System (ADS)

    Hirashima, Hiroshi; Adachi, Kenji; Imai, Hiroaki

    1994-10-01

    In order to densify and to improve the physical properties, TiO2 sol-gel films, about 100 nm in thickness, on silica glass or silicon wafer were implanted with Ar+ or B+ ions. The refractive index of the as-dried films increased and the IR absorption band of OH disappeared after Ar+ implantation. Dehydration and densification of sol-gel films were enhanced by Ar+ implantation. On the other hand, the refractive index and the thickness of the films hardly changed by B+ implantation. However, IR absorption bands attributed to B-O bond were observed after B+ implantation. This suggests that sol-gel films could be chemically modified by ion implantation with reactive ion species.

  9. Nitrogen ion implantation into various materials using 28 GHz electron cyclotron resonance ion source.

    PubMed

    Shin, Chang Seouk; Lee, Byoung-Seob; Choi, Seyong; Yoon, Jang-Hee; Kim, Hyun Gyu; Ok, Jung-Woo; Park, Jin Yong; Kim, Seong Jun; Bahng, Jungbae; Hong, Jonggi; Lee, Seung Wook; Won, Mi-Sook

    2016-02-01

    The installation of the 28 GHz electron cyclotron resonance ion source (ECRIS) ion implantation beamline was recently completed at the Korea Basic Science Institute. The apparatus contains a beam monitoring system and a sample holder for the ion implantation process. The new implantation system can function as a multipurpose tool since it can implant a variety of ions, ranging hydrogen to uranium, into different materials with precise control and with implantation areas as large as 1-10 mm(2). The implantation chamber was designed to measure the beam properties with a diagnostic system as well as to perform ion implantation with an in situ system including a mass spectrometer. This advanced implantation system can be employed in novel applications, including the production of a variety of new materials such as metals, polymers, and ceramics and the irradiation testing and fabrication of structural and functional materials to be used in future nuclear fusion reactors. In this investigation, the first nitrogen ion implantation experiments were conducted using the new system. The 28 GHz ECRIS implanted low-energy, multi-charged nitrogen ions into copper, zinc, and cobalt substrates, and the ion implantation depth profiles were obtained. SRIM 2013 code was used to calculate the profiles under identical conditions, and the experimental and simulation results are presented and compared in this report. The depths and ranges of the ion distributions in the experimental and simulation results agree closely and demonstrate that the new system will enable the treatment of various substrates for advanced materials research. PMID:26931931

  10. Nitrogen ion implantation into various materials using 28 GHz electron cyclotron resonance ion source

    NASA Astrophysics Data System (ADS)

    Shin, Chang Seouk; Lee, Byoung-Seob; Choi, Seyong; Yoon, Jang-Hee; Kim, Hyun Gyu; Ok, Jung-Woo; Park, Jin Yong; Kim, Seong Jun; Bahng, Jungbae; Hong, Jonggi; Lee, Seung Wook; Won, Mi-Sook

    2016-02-01

    The installation of the 28 GHz electron cyclotron resonance ion source (ECRIS) ion implantation beamline was recently completed at the Korea Basic Science Institute. The apparatus contains a beam monitoring system and a sample holder for the ion implantation process. The new implantation system can function as a multipurpose tool since it can implant a variety of ions, ranging hydrogen to uranium, into different materials with precise control and with implantation areas as large as 1-10 mm2. The implantation chamber was designed to measure the beam properties with a diagnostic system as well as to perform ion implantation with an in situ system including a mass spectrometer. This advanced implantation system can be employed in novel applications, including the production of a variety of new materials such as metals, polymers, and ceramics and the irradiation testing and fabrication of structural and functional materials to be used in future nuclear fusion reactors. In this investigation, the first nitrogen ion implantation experiments were conducted using the new system. The 28 GHz ECRIS implanted low-energy, multi-charged nitrogen ions into copper, zinc, and cobalt substrates, and the ion implantation depth profiles were obtained. SRIM 2013 code was used to calculate the profiles under identical conditions, and the experimental and simulation results are presented and compared in this report. The depths and ranges of the ion distributions in the experimental and simulation results agree closely and demonstrate that the new system will enable the treatment of various substrates for advanced materials research.

  11. Implantation of nitrogen, carbon, and phosphorus ions into metals

    SciTech Connect

    Guseva, M.I.; Gordeeva, G.V.

    1987-01-01

    The application of ion implantation for alloying offers a unique opportunity to modify the chemical composition, phase constitution, and microstructure of the surface layers of metals. The authors studied ion implantation of nitrogen and carbon into the surface layers of metallic targets. The phase composition of the implanted layers obtained on the Kh18N10T stainless steel, the refractory molybdenum alloy TsM-6, niobium, and nickel was determined according to the conventional method of recording the x-ray diffraction pattern of the specimens using monochromatic FeK/sub alpha/-radiation on a DRON-2,0 diffractometer. The targets were bombarded at room temperature in an ILU-3 ion accelerator. The implantation of metalloid ions was also conducted with the targets being bombarded with 100-keV phosphorus ions and 40-keV carbon ions.

  12. Ion implantation of silicon in gallium arsenide: Damage and annealing characterizations

    NASA Astrophysics Data System (ADS)

    Pribat, D.; Dieumegard, D.; Croset, M.; Cohen, C.; Nipoti, R.; Siejka, J.; Bentini, G. G.; Correra, L.; Servidori, M.

    1983-05-01

    The purpose of this work is twofold: (i) to study the damage induced by ion implantation, with special attention to low implanted doses; (ii) to study the efficiency of annealing techniques — particularly incoherent light annealing — in order to relate the electrical activity of implanted atoms to damage annealing. We have used three methods to study the damage induced by ion implantation: (1) RBS (or nuclear reactions) in random or in channeling geometry (2) RX double crystal diffractometry and (3) electrical measurements (free carrier profiling). Damage induced by silicon implantation at doses >10 14at/cm 2 can be monitored by all three techniques. However, the sensitivity of RBS is poor and hence this technique is not useful for low implantation doses. As device technology requires dopant levels in the range of 5 × 10 12 atoms/cm 2, we are particularly interested to the development of analytical techniques able to detect the damage at this implantation level. The sensitivity of such techniques was checked by studying homogeneously doped (5 × 10 16 e -/cm 3) and semi-insulating GaAs samples implanted with 3 × 10 12 silicon atoms/cm 2 at 150 keV. The substrate temperature during implantation was 200°C. The damage produced in these samples and its subsequent annealing are evidenced by strong changes in X-ray double crystal diffraction spectra. This method hence appears as a good monitoring technique. Annealing of the implanted layers has been performed using incoherent light sources (xenon lamps) either in flash or continuous conditions. Reference samples have also been thermally annealed (850°C, 20 min in capless conditions). The results are compared, and the electrical carrier profiles obtained after continuous incoherent light irradiation indicate that the implanted silicon atoms are almost dully activated. The advantages and disadvantages of incoherent light irradiation are discussed (surface oxidation, surface damage) in comparison with standard

  13. Ion Implantation into Presolar Grains: A Theoretical Model

    NASA Astrophysics Data System (ADS)

    Verchovsky, A. B.; Wright, I. P.; Pillinger, C. T.

    A numerical model for ion implantation into spherical grains in free space has been developed. It can be applied to single grains or collections of grains with known grain-size distributions. Ion-scattering effects were taken into account using results of computer simulations. Possible isotope and element fractionation of the implanted species was investigated using this model. The astrophysical significance of the model lies in the possible identification of energetically different components (such as noble gases) implanted into presolar grains (such as diamond and SiC) and in establishing implantation energies of the components.

  14. Investigation of Mn-implanted n-Si by low-energy ion beam deposition

    NASA Astrophysics Data System (ADS)

    Liu, Lifeng; Chen, Nuofu; Song, Shulin; Yin, Zhigang; Yang, Fei; Chai, Chunlin; Yang, Shaoyan; Liu, Zhikai

    2005-01-01

    Mn ions were implanted to n-type Si(0 0 1) single crystal by low-energy ion beam deposition technique with an energy of 1000 eV and a dose of 7.5×10 17 cm -2. The samples were held at room temperature and at 300 °C during implantation. Auger electron spectroscopy depth profiles of samples indicate that the Mn ions reach deeper in the sample implanted at 300 °C than in the sample implanted at room temperature. X-ray diffraction measurements show that the structure of the sample implanted at room temperature is amorphous while that of the sample implanted at 300 °C is crystallized. There are no new phases found except silicon both in the two samples. Atomic force microscopy images of samples indicate that the sample implanted at 300 °C has island-like humps that cover the sample surface while there is no such kind of characteristic in the sample implanted at room temperature. The magnetic properties of samples were investigated by alternating gradient magnetometer (AGM). The sample implanted at 300 °C shows ferromagnetic behavior at room temperature.

  15. Determination of migration of ion-implanted Ar and Zn in silica by backscattering spectrometry

    NASA Astrophysics Data System (ADS)

    Szilágyi, E.; Bányász, I.; Kótai, E.; Németh, A.; Major, C.; Fried, M.; Battistig, G.

    2015-03-01

    It is well known that the refractive indices of lots of materials can be modified by ion implantation, which is important for waveguide fabrication. In this work the effect of Ar and Zn ion implantation on silica layers was investigated by Rutherford Backscattering Spectrometry (RBS) and Spectroscopic Ellipsometry (SE). Silica layers produced by chemical vapour deposition technique on single crystal silicon wafers were implanted by Ar and Zn ions with a fluence of 1-2 ×1016 Ar/cm2 and 2.5 ×1016 Zn/cm2, respectively. The refractive indices of the implanted silica layers before and after annealing at 300°C and 600°C were determined by SE. The migration of the implanted element was studied by real-time RBS up to 500°C. It was found that the implanted Ar escapes from the sample at 300°C. Although the refractive indices of the Ar-implanted silica layers were increased compared to the as-grown samples, after the annealing this increase in the refractive indices vanished. In case of the Zn-implanted silica layer both the distribution of the Zn and the change in the refractive indices were found to be stable. Zn implantation seems to be an ideal choice for producing waveguides.

  16. Mechanical characterization of several ion-implanted alloys: nanoindentation testing, wear testing and finite element modeling

    NASA Astrophysics Data System (ADS)

    Bourcier, R. J.; Follstaedt, D. M.; Dugger, M. T.; Myers, S. M.

    1991-07-01

    The influence of ion implantation on the mechanical properties of metal alloys has been examined using a variety of experimental and numerical techniques. Ultralow load indentation testing and finite element modeling has been used for the aluminum/oxygen to extract fundamental mechanical properties. Aluminum implanted with 20 at.% O exhibits extraordinary strength, as high as 3300 MPa. The degree of strengthening expected for this Al(O) alloy on the basis of the observed microstructure of fine (1.5-3.5 nm) oxide precipitates was estimated using several micromechanical models, and the results agree with our experimental findings. Pin-on-disk tribological characterization of aluminum implanted with 10 at.% oxygen revealed that the ion-beam treatment reduced the average friction coefficient from greater than 1.0 (for pure Al) to approximately 0.25 (for Al(O)). Large-amplitude stick-slip oscillations, which occur within the first two cycles for pure aluminum, were postponed to 30-50 cycles for the ion-implanted material. Two stainless steels which have been amorphized by implantation, 304 implanted with C and 440C implanted with Ti + C, show measurable hardening with implantation, of the order of 40 and 15%, respectively. In addition, nanoindentation within pin-on-disk wear tracks on 440C reveals that the mechanical state of the extensively deformed implanted layer is apparently unchanged from its initial state.

  17. A technique for removal of a fractured implant abutment screw.

    PubMed

    Kurt, Murat; Güler, Ahmet Umut; Duran, İbrahim

    2013-12-01

    The aim of this technique report was to present a procedure for removal of a fractured implant abutment screw. Whatever the cause, when an abutment fracture has occurred, the fractured screw segment inside the implant must be removed. The methods used by the clinicians may include the use of an endo-explorer self-made screwdriver and the use of implant repair kit available for some implant systems. The advantage of the presented method is that it may be extended to other implant systems that do not have a special repair kit and also that the technique is simple and does not require special equipment. PMID:21905898

  18. Microstructure evolution in carbon-ion implanted sapphire

    SciTech Connect

    Orwa, J. O.; McCallum, J. C.; Jamieson, D. N.; Prawer, S.; Peng, J. L.; Rubanov, S.

    2010-01-15

    Carbon ions of MeV energy were implanted into sapphire to fluences of 1x10{sup 17} or 2x10{sup 17} cm{sup -2} and thermally annealed in forming gas (4% H in Ar) for 1 h. Secondary ion mass spectroscopy results obtained from the lower dose implant showed retention of implanted carbon and accumulation of H near the end of range in the C implanted and annealed sample. Three distinct regions were identified by transmission electron microscopy of the implanted region in the higher dose implant. First, in the near surface region, was a low damage region (L{sub 1}) composed of crystalline sapphire and a high density of plateletlike defects. Underneath this was a thin, highly damaged and amorphized region (L{sub 2}) near the end of range in which a mixture of i-carbon and nanodiamond phases are present. Finally, there was a pristine, undamaged sapphire region (L{sub 3}) beyond the end of range. In the annealed sample some evidence of the presence of diamond nanoclusters was found deep within the implanted layer near the projected range of the C ions. These results are compared with our previous work on carbon implanted quartz in which nanodiamond phases were formed only a few tens of nanometers from the surface, a considerable distance from the projected range of the ions, suggesting that significant out diffusion of the implanted carbon had occurred.

  19. Ion-implanted planar-buried-heterostructure diode laser

    DOEpatents

    Brennan, Thomas M.; Hammons, Burrell E.; Myers, David R.; Vawter, Gregory A.

    1991-01-01

    A Planar-Buried-Heterostructure, Graded-Index, Separate-Confinement-Heterostructure semiconductor diode laser 10 includes a single quantum well or multi-quantum well active stripe 12 disposed between a p-type compositionally graded Group III-V cladding layer 14 and an n-type compositionally graded Group III-V cladding layer 16. The laser 10 includes an ion implanted n-type region 28 within the p-type cladding layer 14 and further includes an ion implanted p-type region 26 within the n-type cladding layer 16. The ion implanted regions are disposed for defining a lateral extent of the active stripe.

  20. Photosensitivity enhancement of PLZT ceramics by positive ion implantation

    DOEpatents

    Peercy, P.S.; Land, C.E.

    1980-06-13

    The photosensitivity of lead lanthanum zirconate titanate (PLZT) ceramic material used in high resolution, high contrast, and non-volatile photoferroelectric image storage and display devices is enhanced significantly by positive ion implantation of the PLZT near its surface. Ions that are implanted include H/sup +/, He/sup +/, Ar/sup +/, and a preferred co-implant of Ar/sup +/ and Ne/sup +/. The positive ion implantation advantageously serves to shift the band gap energy threshold of the PLZT material from near-uv light to visible blue light. As a result, photosensitivity enhancement is such that the positive ion implanted PLZT plate is sensitive even to sunlight and conventional room lighting, such as fluorescent and incandescent light sources. The method disclosed includes exposing the PLZT plate to these positive ions of sufficient density and with sufficient energy to provide an image. The PLZT material may have a lanthanum content ranging from 5 to 10%; a lead zirconate content ranging from 62 to 70 mole %; and a lead titanate content ranging from 38 to 30%. The region of ion implantation is in a range from 0.1 to 2 microns below the surface of the PLZT plate. Density of ions is in the range from 1 x 10/sup 12/ to 1 x 10/sup 17/ ions/cm/sup 2/ and having an energy in the range from 100 to 500 keV.

  1. Modification of medical metals by ion implantation of copper

    NASA Astrophysics Data System (ADS)

    Wan, Y. Z.; Xiong, G. Y.; Liang, H.; Raman, S.; He, F.; Huang, Y.

    2007-10-01

    The effect of copper ion implantation on the antibacterial activity, wear performance and corrosion resistance of medical metals including 317 L of stainless steels, pure titanium, and Ti-Al-Nb alloy was studied in this work. The specimens were implanted with copper ions using a MEVVA source ion implanter with ion doses ranging from 0.5 × 10 17 to 4 × 10 17 ions/cm 2 at an energy of 80 keV. The antibacterial effect, wear rate, and inflexion potential were measured as a function of ion dose. The results obtained indicate that copper ion implantation improves the antibacterial effect and wear behaviour for all the three medical materials studied. However, corrosion resistance decreases after ion implantation of copper. Experimental results indicate that the antibacterial property and corrosion resistance should be balanced for medical titanium materials. The marked deteriorated corrosion resistance of 317 L suggests that copper implantation may not be an effective method of improving its antibacterial activity.

  2. Bacterial adhesion on ion-implanted stainless steel surfaces

    NASA Astrophysics Data System (ADS)

    Zhao, Q.; Liu, Y.; Wang, C.; Wang, S.; Peng, N.; Jeynes, C.

    2007-08-01

    Stainless steel disks were implanted with N +, O + and SiF 3+, respectively at the Surrey Ion Beam Centre. The surface properties of the implanted surfaces were analyzed, including surface chemical composition, surface topography, surface roughness and surface free energy. Bacterial adhesion of Pseudomonas aeruginosa, Staphylococcus epidermidis and Staphylococcus aureus, which frequently cause medical device-associated infections was evaluated under static condition and laminar flow condition. The effect of contact time, growth media and surface properties of the ion-implanted steels on bacterial adhesion was investigated. The experimental results showed that SiF 3+-implanted stainless steel performed much better than N +-implanted steel, O +-implanted steel and untreated stainless steel control on reducing bacterial attachment under identical experimental conditions.

  3. Ion implantation induced nanotopography on titanium and bone cell adhesion

    NASA Astrophysics Data System (ADS)

    Braceras, Iñigo; Vera, Carolina; Ayerdi-Izquierdo, Ana; Muñoz, Roberto; Lorenzo, Jaione; Alvarez, Noelia; de Maeztu, Miguel Ángel

    2014-08-01

    Permanent endo-osseous implants require a fast, reliable and consistent osseointegration, i.e. intimate bonding between bone and implant, so biomechanical loads can be safely transferred. Among the parameters that affect this process, it is widely admitted that implant surface topography, surface energy and composition play an important role. Most surface treatments to improve osseointegration focus on micro-scale features, as few can effectively control the effects of the treatment at nanoscale. On the other hand, ion implantation allows controlling such nanofeatures. This study has investigated the nanotopography of titanium, as induced by different ion implantation surface treatments, its similarity with human bone tissue structure and its effect on human bone cell adhesion, as a first step in the process of osseointegration. The effect of ion implantation treatment parameters such as energy (40-80 keV), fluence (1-2 e17 ion/cm2) and ion species (Kr, Ar, Ne and Xe) on the nanotopography of medical grade titanium has been measured and assessed by AFM and contact angle. Then, in vitro tests have been performed to assess the effect of these nanotopographies on osteoblast adhesion. The results have shown that the nanostructure of bone and the studied ion implanted surfaces, without surface chemistry modification, are in the same range and that such modifications, in certain conditions, do have a statistically significant effect on bone tissue forming cell adhesion.

  4. The Development and Evolution of Ion Implanters in the Semiconductor Industry

    NASA Astrophysics Data System (ADS)

    Armour, Dave G.

    2008-11-01

    By the end of the 1960's, the development of ion beam systems for isotope separation and materials research had reached the stage at which knowledge bases in the areas of ion beam formation and transport and the physics of atomic collisions in solids made it practical to consider the use of ion implantation as a means of modifying the near surface properties of solid materials. The beam currents and energies available made the technique particularly compatible with the doping requirements of the silicon devices being produced at that time. However, incorporation of the technique into a high volume manufacturing environment required the immediate development of new target handling facilities and improvements in machine reliability. While the manner in which ion implanters have evolved over the past forty years has continued to be dictated by the changing demands of the silicon processing industry, the dramatic reduction in transistor size and the increase in integrated circuit complexity have had significant implications for the qualities of the ion beams themselves, particularly in high current, ultra-low energy applications. Since the first commercial implanters were introduced, highly developed medium current, high current and high energy machines have evolved. In the medium current and high energy sectors, well understood ion optical principles have enabled ingenious and highly effective beam formation and transport systems to be designed. As these machines evolved, extensive studies of the implanted material using ion beam based techniques such as Rutherford backscattering and channelling provided a growing understanding of the fundamental radiation damage and annealing processes that are inevitably associated with the implantation process. For high current machines, particularly those operating in the so-called eV implantation range, beam formation and transport processes become considerably more complex and established ion optical design principles must be

  5. Software for goniometer control in the Triple Ion Implantation Facility

    SciTech Connect

    Allen, W.R.

    1994-02-01

    A computer program is described tat controls the goniometer employed in the ion scattering chamber of the Triple Ion Implantation Facility (TIF) in the Metals and Ceramics Division at Oak Ridge National Laboratory. Details of goniometer operation and its incorporation into the ion scattering setup specific to the TIF are also discussed.

  6. Deformation characteristics of the near-surface layers of zirconia ceramics implanted with aluminum ions

    NASA Astrophysics Data System (ADS)

    Ghyngazov, S. A.; Vasiliev, I. P.; Frangulyan, T. S.; Chernyavski, A. V.

    2015-10-01

    The effect of ion treatment on the phase composition and mechanical properties of the near-surface layers of zirconium ceramic composition 97 ZrO2-3Y2O3 (mol%) was studied. Irradiation of the samples was carried out by accelerated ions of aluminum with using vacuum-arc source Mevva 5-Ru. Ion beam had the following parameters: the energy of the accelerated ions E = 78 keV, the pulse current density Ji = 4mA / cm2, current pulse duration equal τ = 250 mcs, pulse repetition frequency f = 5 Hz. Exposure doses (fluence) were 1016 и 1017 ion/cm2. The depth distribution implanted ions was studied by SIMS method. It is shown that the maximum projected range of the implanted ions is equal to 250 nm. Near-surface layers were investigated by X-ray diffraction (XRD) at fixed glancing incidence angle. It is shown that implantation of aluminum ions into the ceramics does not lead to a change in the phase composition of the near-surface layer. The influence of implanted ions on mechanical properties of ceramic near-surface layers was studied by the method of dynamic nanoindentation using small loads on the indenter P=300 mN. It is shown that in ion- implanted ceramic layer the processes of material recovery in the deformed region in the unloading mode proceeds with higher efficiency as compared with the initial material state. The deformation characteristics of samples before and after ion treatment have been determined from interpretation of the resulting P-h curves within the loading and unloading sections by the technique proposed by Oliver and Pharr. It was found that implantation of aluminum ions in the near-surface layer of zirconia ceramics increases nanohardness and reduces the Young's modulus.

  7. A decaborane ion source for high current implantation

    NASA Astrophysics Data System (ADS)

    Perel, Alex S.; Loizides, William K.; Reynolds, William E.

    2002-02-01

    Progressive semiconductor device scaling in each technology node requires the formation of shallower junctions, and thus lower energy implants. The difficulties associated with extraction and transport of low energy beams often result in a loss in wafer throughput. Implantation of boron using the molecular compound decaborane has been found to allow for the shallow implantation of boron without a significant design change in the implanter. The decaborane molecule has 10 boron atoms and 14 hydrogen atoms. The implanted dose is ten times the electrical dose and the implanted depth is equivalent to the depth of a boron beam at 1/11th of the extraction energy. This advantage can only be exploited with an ion source that does not destroy the fragile molecule. We report on the design of an ion source capable of ionizing decaborane without significant fragmentation of the molecule. After it was shown that the decaborane molecule fragments above 350 °C an ion source was designed to prevent thermal dissociation of the molecule. Competitive boron dose rates were achieved using this source in a commercial high current implanter. In addition, evidence is shown that a decaborane dimer is formed in the ion source and can be implanted.

  8. Caborane beam from ITEP Bernas ion source for semiconductor implanters

    SciTech Connect

    Seleznev, D.; Hershcovitch, A.; Kropachev, G.; Kozlov, A.; Kuibeda, R.; Koshelev, V.; Kulevoy, T.; Jonson, B.; Poole, J.; Alexeyenko, O.; Gurkova, E.; Oks, E.; Gushenets, V.; Polozov, S.; Masunov, E.

    2010-02-01

    A joint research and development of steady state intense boron ion sources for hundreds of electron-volt ion implanters has been in progress for the past 5 years. The difficulties of extraction and transportation of low energy boron beams can be solved by implanting clusters of boron atoms. In Institute for Theoretical and Experimental Physics (ITEP) the Bernas ion source successfully generated the beam of decaborane ions. The carborane (C{sub 2}B{sub 10}H{sub 12}) ion beam is more attractive material due to its better thermal stability. The results of carborane ion beam generation are presented. The result of the beam implantation into the silicon wafer is presented as well.

  9. Improving Sustainability of Ion Implant Modules

    NASA Astrophysics Data System (ADS)

    Mayer, Jim

    2011-01-01

    Semiconductor fabs have long been pressured to manage capital costs, reduce energy consumption and increasingly improve efforts to recycle and recover resources. Ion implant tools have been high-profile offenders on all three fronts. They draw such large volumes of air for heat dissipation and risk reduction that historically, they are the largest consumer of cleanroom air of any process tool—and develop energy usage and resource profiles to match. This paper presents a documented approach to reduce their energy consumption and dramatically downsize on-site facilities support for cleanroom air manufacture and abatement. The combination produces significant capital expenditure savings. The case entails applying SAGS Type 1 (sub-atmospheric gas systems) toxic gas packaging to enable engineering adaptations that deliver the energy savings and cost benefits without any reduction in environmental health and safety. The paper also summarizes benefits as they relate to reducing a fabs carbon emission footprint (and longer range advantages relative to potential cap and trade programs) with existing technology.

  10. SEM analysis of ion implanted SiC

    NASA Astrophysics Data System (ADS)

    Malherbe, Johan B.; van der Berg, N. G.; Botha, A. J.; Friedland, E.; Hlatshwayo, T. T.; Kuhudzai, R. J.; Wendler, E.; Wesch, W.; Chakraborty, P.; da Silveira, E. F.

    2013-11-01

    SiC is a material used in two future energy production technologies, firstly as a photovoltaic layer to harness the UV spectrum in high efficient power solar cells, and secondly as a diffusion barrier material for radioactive fission products in the fuel elements of the next generation of nuclear power plants. For both applications, there is an interest in the implantation of reactive and non-reactive ions into SiC and their effects on the properties of the SiC. In this study 360 keV Ag+, I+ and Xe+ ions were separately implanted into 6H-SiC and in polycrystalline SiC at various substrate temperatures. The implanted samples were also annealed in vacuum at temperatures ranging from 900 °C to 1600 °C for various times. In recent years, there had been significant advances in scanning electron microscopy (SEM) with the introduction of an in-lens detector combined with field emission electron guns. This allows defects in solids, such as radiation damage created by the implanted ions, to be detected with SEM. Cross-sectional SEM images of 6H-SiC wafers implanted with 360 keV Ag+ ions at room temperature and at 600 °C and then vacuum annealed at different temperatures revealed the implanted layers and their thicknesses. A similar result is shown of 360 keV I+ ions implanted at 600 °C into 6H-SiC and annealed at 1600 °C. The 6H-SiC is not amorphized but remained crystalline when implanting at 600 °C. There are differences in the microstructure of 6H-SiC implanted with silver at the two temperatures as well as with reactive iodine ions. Voids (bubbles) are created in the implanted layers into which the precipitation of silver and iodine can occur after annealing of the samples. The crystallinity of the substrate via implantation temperature caused differences in the distribution and size of the voids. Implantation of xenon ions in polycrystalline SiC at 350 °C does not amorphize the substrate as is the case with room temperature heavy ion bombardment. Subsequent

  11. 2D-ACAR Studies on Swift Heavy Ion Si-Implanted GaAs

    NASA Astrophysics Data System (ADS)

    Sivaji, K.; Selvakumar, S.

    Material properties modification by high energy heavy ion implantation is a prospective technology leading to many device fabrications. This technique induces defects and hence the physical properties of the materials are modified. The effects of swift heavy ion implantation induced defects by 120 MeV 28+Si ion implantation and doping in SI-GaAs are presented from the electron momentum distribution (EMD) of vacancy-type defects studied by two-dimensional angular correlation of annihilation radiation (2D-ACAR). The positron trapping due to the influence of high-energy Si- implantation in GaAs (n-type) is compared with the corresponding spectra of SI- GaAs and with Si-doped (n-type) GaAs. The EMD of the implanted sample shows a distinct increased isotropic distribution with a characteristic transform of its structure as evident from the low momentum region compared to the pristine sample. The characteristics of defects created by Si doping and by 120 MeV 28+Si ion implantation of undoped semi-insulating (SI) GaAS are discussed. These results indicate the nature of positron trapping in open volume defects such as vacancy clusters created by implantation.

  12. Behavior of PET implanted by Ti, Ag, Si and C ion using MEVVA implantation

    NASA Astrophysics Data System (ADS)

    Wu, Yuguang; Zhang, Tonghe; Zhang, Yanwen; Zhang, Huixing; Zhang, Xiaoji; Zhou, Gu

    2001-01-01

    Polyethylene terephthalane (PET) has been modified with Ti, Ag, Si and C ions from a metal vapor arc source (MEVVA). Ti, Ag, Si and C ions were implanted with acceleration voltage 40 kV to fluences ranging from 1×10 16 to 2×10 17 cm -2. The surface of implanted PET darkened with increasing ion dose, when the metal ion dose was greater than 1×10 17 cm -2 the color changed to metallic bright. The surface resistance decreases by 5-6 orders of magnitude with increasing dose. The resistivity is stable after long-term storage. The depth of Ti- and Ag-implanted layer is approximately 150 and 80 nm measured by Rutherford backscattering (RBS), respectively. TEM photos revealed the presence of Ti and Ag nano-meter particles on the surface resulting from the high-dose implantation. Ti and Ag ion implantations improved conductivity and wear resistance significantly. The phase and structural changes were obtained by X-ray diffraction (XRD). It can be seen that nano-meter particles of Ti precipitation, TiO 2 and Ti-carbides have been formed in implanted layer. Nano-hardness of implanted PET has been measured by a nano-indenter. The results show that the surface hardness, modulus and wear resistance could be increased.

  13. Experiments and Theory of Ablation Plasma Ion Implantation

    NASA Astrophysics Data System (ADS)

    Gilgenbach, R. M.; Qi, B.; Lau, Y. Y.; Johnston, M. D.; Doll, G. L.; Lazarides, A.

    2000-10-01

    Research is underway to accelerate laser ablation plume ions for implantation into substrates. Ablation plasma ion implantation (APII) biases the deposition substrate to a large negative voltage. APII has the advantages of direct acceleration and implantation of ions from metals or any other solid targets. This process is environmentally friendly because it avoids the use of toxic gaseous precursors. Initial experiments are directed towards the implantation of iron ions into silicon substrates at negative voltages from 2-10 kV. A KrF laser ablates iron targets at pulse energies up to 600 mJ and typical repetition rates of 10 Hz. Parameters which can be varied include laser fluence, relative timing of laser and high voltage pulse, and target-to-substrate distance. Spectroscopic diagnostics yield Fe plasma plume electron temperatures up to about 10 eV. Analysis of films will compare surface morphology, hardness and adhesion between deposited Vs accelerated-implanted plumes. A simple one dimensional theory is developed [1] to calculate the implanted ion current, extracted from the ion matrix sheath, as a function of time for various substrate-plume separations. This model accurately recovers Lieberman's classic results when the plume front is initially in contact with the substrate. [1] B. Qi, Y. Y. Lau, and R. M. Gilgenbach, Appl. Phys. Lett. (to be published). * This research is supported by the National Science Foundation.

  14. Physical and Tribological Characteristics of Ion-Implanted Diamond Films

    NASA Technical Reports Server (NTRS)

    Miyoshi, K.; Heidger, S.; Korenyi-Both, A. L.; Jayne, D. T.; Herrera-Fierro, P.; Shogrin, B.; Wilbur, P. J.; Wu, R. L. C.; Garscadden, A.; Barnes, P. N.

    1994-01-01

    Unidirectional sliding friction experiments were conducted with a natural, polished diamond pin in contact with both as-deposited and carbon-ion-implanted diamond films in ultrahigh vacuum. Diamond films were deposited on silicon, silicon carbide, and silicon nitride by microwave-plasma-assisted chemical vapor deposition. The as-deposited diamond films were impacted with carbon ions at an accelerating energy of 60 keV and a current density of 50 micron A/cm(exp 2) for approximately 6 min, resulting in a dose of 1.2 x 10(exp 17) carbon ions/cm(exp 2). The results indicate that the carbon ion implantation produced a thin surface layer of amorphous, nondiamond carbon. The nondiamond carbon greatly decreased both friction and wear of the diamond films. The coefficients of friction for the carbon-ion-implanted, fine-grain diamond films were less than 0.1, factors of 20 to 30 lower than those for the as-deposited, fine-grain diamond films. The coefficients of friction for the carbon-ion-implanted, coarse-grain diamond films were approximately 0.35, a factor of five lower than those for the as-deposited, coarse-grain diamond films. The wear rates for the carbon-ion-implanted, diamond films were on the order of 10(exp -6) mm(exp 3)/Nm, factors of 30 to 80 lower than that for the as-deposited diamond films, regardless of grain size. The friction of the carbon-ion-implanted diamond films was greatly reduced because the amorphous, nondiamond carbon, which had a low shear strength, was restricted to the surface layers (less than 0.1 micron thick) and because the underlying diamond materials retained their high hardness. In conclusion, the carbon-ion-implanted, fine-grain diamond films can be used effectively as wear resistant, self-lubricating coatings for ceramics, such as silicon nitride and silicon carbide, in ultrahigh vacuum.

  15. Low-temperature, site selective graphitization of SiC via ion implantation and pulsed laser annealing

    SciTech Connect

    Lemaitre, Maxime G.; Tongay, Sefaattin; Wang, Xiaotie; Venkatachalam, Dinesh K.; Elliman, Robert G.; Fridmann, Joel; Gila, Brent P.; Appleton, Bill R.; Hebard, Arthur F.; Ren, Fan

    2012-05-07

    A technique is presented to selectively graphitize regions of SiC by ion implantation and pulsed laser annealing (PLA). Nanoscale features are patterned over large areas by multi-ion beam lithography and subsequently converted to few-layer graphene via PLA in air. Graphitization occurs only where ions have been implanted and without elevating the temperature of the surrounding substrate. Samples were characterized using Raman spectroscopy, ion scattering/channeling, SEM, and AFM, from which the degree of graphitization was determined to vary with implantation species, damage and dose, laser fluence, and pulsing. Contrasting growth regimes and graphitization mechanisms during PLA are discussed.

  16. The Effect of Ag and Ag+N Ion Implantation on Cell Attachment Properties

    NASA Astrophysics Data System (ADS)

    Urkac, Emel Sokullu; Oztarhan, Ahmet; Tihminlioglu, Funda; Gurhan, Ismet Deliloglu; Iz, Sultan Gulce; Oks, Efim; Nikolaev, Alexey; Ila, Daryush

    2009-03-01

    Implanted biomedical prosthetic devices are intended to perform safely, reliably and effectively in the human body thus the materials used for orthopedic devices should have good biocompatibility. Ultra High Molecular Weight Poly Ethylene (UHMWPE) has been commonly used for total hip joint replacement because of its very good properties. In this work, UHMWPE samples were Ag and Ag+N ion implanted by using the Metal-Vapor Vacuum Arc (MEVVA) ion implantation technique. Samples were implanted with a fluency of 1017 ion/cm2 and extraction voltage of 30 kV. Rutherford Backscattering Spectrometry (RBS) was used for surface studies. RBS showed the presence of Ag and N on the surface. Cell attachment properties investigated with model cell lines (L929 mouse fibroblasts) to demonstrate that the effect of Ag and Ag+N ion implantation can favorably influence the surface of UHMWPE for biomedical applications. Scanning electron microscopy (SEM) was used to demonstrate the cell attachment on the surface. Study has shown that Ag+N ion implantation represents more effective cell attachment properties on the UHMWPE surfaces.

  17. The Effect of Ag and Ag+N Ion Implantation on Cell Attachment Properties

    SciTech Connect

    Urkac, Emel Sokullu; Oztarhan, Ahmet; Gurhan, Ismet Deliloglu; Iz, Sultan Gulce; Tihminlioglu, Funda; Oks, Efim; Nikolaev, Alexey; Ila, Daryush

    2009-03-10

    Implanted biomedical prosthetic devices are intended to perform safely, reliably and effectively in the human body thus the materials used for orthopedic devices should have good biocompatibility. Ultra High Molecular Weight Poly Ethylene (UHMWPE) has been commonly used for total hip joint replacement because of its very good properties. In this work, UHMWPE samples were Ag and Ag+N ion implanted by using the Metal-Vapor Vacuum Arc (MEVVA) ion implantation technique. Samples were implanted with a fluency of 1017 ion/cm2 and extraction voltage of 30 kV. Rutherford Backscattering Spectrometry (RBS) was used for surface studies. RBS showed the presence of Ag and N on the surface. Cell attachment properties investigated with model cell lines (L929 mouse fibroblasts) to demonstrate that the effect of Ag and Ag+N ion implantation can favorably influence the surface of UHMWPE for biomedical applications. Scanning electron microscopy (SEM) was used to demonstrate the cell attachment on the surface. Study has shown that Ag+N ion implantation represents more effective cell attachment properties on the UHMWPE surfaces.

  18. Superconducting Properties of Ion-Implanted Gold - Thin Films.

    NASA Astrophysics Data System (ADS)

    Jisrawi, Najeh Mohamed

    The superconducting properties of thin Au _{x}rm Si_{1-x} films prepared by ion beam implantation and ion beam mixing are studied. The films are prepared by evaporation of single Au layers on Si substrates and mixing them with Si, Ar, or Xe, or by Xe beam mixing of alternate multilayers of Au and Si sputtered on rm Al_2 O_3 substrates. The superconducting transition temperature and upper critical fields are determined by measuring the temperature and magnetic field dependence of resistivity. Temperatures as low as 20mK and magnetic fields as high as 8 T were used. Superconductivity in these films is discussed in connection with metastable metallic phases that are reportedly produced in the Au -Si system by high quenching rate preparation techniques like quenching from the vapor or the melt or ion implantation. Preliminary structural studies provide evidence for the existence of these phases and near-edge X-ray absorption and X-ray photoelectron spectroscopy measurements indicate a metallic type of bonding from which compound formation is inferred. The quality of the films is strongly dependent on the conditions of implantation. The maximum superconducting transition temperature attained is about 1.2 K. The upper critical fields have a maximum of 6T. An unusual double transition in the field dependence of resistivity is observed at low temperatures. The effect is very pronounced at compositions near x = 0.5 where the maximum T_{c} occurs. A model is presented to explain this result which invokes the properties of the metastable metallic phases and assumes the formation of more than two such phases in the same sample as the implantation dose increases. The Si-Au interface plays an important role in understanding the model and in interpreting the results of this thesis in general. The origin of superconductivity in the Au -Si system is discussed by relating the experimental results to the various mechanisms suggested in the literature. The implications of the study of

  19. Optical imaging and information storage in ion implanted ferroelectric ceramics

    SciTech Connect

    Peercy, P.S.; Land, C.E.

    1981-11-01

    Photographic images can be stored in ferroelectric-phase lead lanthanum zirconate titanate (PLZT) ceramics using a novel photoferroelectric effect. These images are nonvolatile but erasable and can be switched from positive to negative by application of an electric field. We have found that the photosensitivity of ferroelectric PLZT is dramatically improved by ion implantation into the surface exposed to image light. For example, the intrinsic photosensitivity to near-UV light is increased by as much as four orders of magnitude by coimplantation with Ar and Ne. The increased photosensitivity results from implantation-induced decreases in dark conductivity and dielectric constant in the implanted layer. Furthermore, the increased photoferroelectric sensitivity has recently been extended from the near-UV to the visible spectrum by implants of Al and Cr. Ion-implanted PLZT is the most sensitive, nonvolatile, selectively-erasable image storage medium currently known.

  20. Influence of Si ion implantation on structure and morphology of g-C3N4

    NASA Astrophysics Data System (ADS)

    Varalakshmi, B.; Sreenivasulu, K. V.; Asokan, K.; Srikanth, V. V. S. S.

    2016-07-01

    Effect of Si ion implantation on structural and morphological features of graphite-like carbon nitride (g-C3N4) was investigated. g-C3N4 was prepared by using a simple atmospheric thermal decomposition process. The g-C3N4 pellets were irradiated with a Si ion beam of energy 200 keV with different fluencies. Structural, morphological and elemental, and phase analysis of the implanted samples in comparison with the pristine samples was carried out by using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) with energy dispersive spectroscopy (EDS) and Fourier transform infrared spectroscopy (FTIR) techniques, respectively. The observations revealed that Si ion implantation results in a negligible change in the crystallite size and alteration of the network-like to the sheet-like morphology of g-C3N4 and Si ions in the g-C3N4 network.

  1. Photosensitivity enhancement of PLZT ceramics by positive ion implantation

    SciTech Connect

    Land, C.E.; Peercy, P.S.

    1983-07-05

    The photosensitivity of lead lanthanum zirconate titanate (PLZT) ceramic material used in high resolution, high contrast, and non-volatile photoferroelectric image storage and display devices is enhanced significantly by positive ion implantation of the PLZT near its surface. Implanted ions include H/sup +/, He/sup +/, Ne/sup +/, Ar/sup +/, as well as chemically reactive ions from Fe, Cr, and Al. The positive ion implantation advantageously serves to shift the absorption characteristics of the PLZT material from near-UV light to visible light. As a result, photosensitivity enhancement is such that the positive ion implanted PLZT plate is sensitive even to sunlight and conventional room lighting, such as fluorescent and incandescent light sources. The method disclosed includes exposing the PLZT plate to the positive ions at sufficient density, from 1 X 10/sup 12/ to 1 X 10/sup 17/, and with sufficient energy, from 100 to 500 KeV, to provide photosensitivity enhancement. The PLZT material may have a lanthanum content ranging from 5 to 10%, a lead zirconate content of 62 to 70 mole %, and a lead titanate content of 38 to 30%. The ions are implanted at a depth of 0.1 to 2 microns below the surface of the PLZT plate.

  2. Photosensitivity enhancement of PLZT ceramics by positive-ion implantation

    SciTech Connect

    Peercy, P.S.; Land, C.E.

    1982-01-28

    The photosensitivity of lead lanthanum zirconate titanate (PLZT) ceramic material used in high resolution, high contrast, and nonvolatile photoferroelectric image storage and display devices is enhanced significantly by positive ion implantation of the PLZT near its surface. Implanted ions include H/sup +/, He/sup +/, Ne/sup +/, Ar/sup +/, as well as chemically reactive ions from Fe, Cr, and Al. The positive ion implantation advantageously serves to shift the absorption characteristics of the PLZT material from near-uv light to visible light. As a result, photosensitivity enhancement is such that the positive ion implanted PLZT plate is sensitive even to sunlight and conventional room lighting, such as fluorescent and incandescent light sources. The method disclosed includes exposing the PLZT plate to the positive ions at sufficient density, from 1 x 10/sup 12/ to 1 x 10/sup 17/, and with sufficient energy, from 100 to 500 keV, to provide photosensitivity enhancement. The PLZT material may have a lanthanum content ranging from 5 to 10%, a lead zirconate content of 62 to 70 mole %, and a lead titanate content of 38 to 30%. The ions are implanted at a depth of 0.1 to 2 microns below the surface of the PLZT plate.

  3. Photosensitivity enhancement of PLZT ceramics by positive ion implantation

    DOEpatents

    Land, Cecil E.; Peercy, Paul S.

    1983-01-01

    The photosensitivity of lead lanthanum zirconate titanate (PLZT) ceramic material used in high resolution, high contrast, and non-volatile photoferroelectric image storage and display devices is enhanced significantly by positive ion implantation of the PLZT near its surface. Implanted ions include H.sup.+, He.sup.+, Ne.sup.+, Ar.sup.+, as well as chemically reactive ions from Fe, Cr, and Al. The positive ion implantation advantageously serves to shift the absorption characteristics of the PLZT material from near-UV light to visible light. As a result, photosensitivity enhancement is such that the positive ion implanted PLZT plate is sensitive even to sunlight and conventional room lighting, such as fluorescent and incandescent light sources. The method disclosed includes exposing the PLZT plate to the positive ions at sufficient density, from 1.times.10.sup.12 to 1.times.10.sup.17, and with sufficient energy, from 100 to 500 KeV, to provide photosensitivity enhancement. The PLZT material may have a lanthanum content ranging from 5 to 10%, a lead zirconate content of 62 to 70 mole %, and a lead titanate content of 38 to 30%. The ions are implanted at a depth of 0.1 to 2 microns below the surface of the PLZT plate.

  4. Improvement of Contact Resistance with Molecular Ion Implantation

    SciTech Connect

    Lee, Kyung Won; Lee, Jin Ku; Oh, Jae Geun; Ju, Min Ae; Jeon, Seung Joon; Ku, Ja Chun; Park, Sung Ki; Huh, Tae Hoon; Kim, Steve; Ra, Geum Joo; Harris, Mark A.; Reece, Ronald N.; Yoon, Dae Ho

    2008-11-03

    Basic characteristics of ClusterBoron (B{sub 18}H{sub 22}) implantation were investigated for improving contact resistance in DRAM devices. Generally, {sup 49}BF{sub 2} has been widely used for contact implant application in DRAM manufacturing because of its higher productivity compared to monomer boron ({sup 11}B). However, because of limited activation in a low thermal budget ({approx}800 deg. C) anneal, the sheet resistance was saturated for doses over 5x10{sup 15} ions/cm{sup 2}. Although many investigations have been reported, such as {sup 30}BF implant mixed implant with monomer boron etc., no practical solution has been found for dramatic improvement of contact resistance in a productive manner. B{sub 18}H{sub 22} was developed to overcome the productivity limitations encountered in low energy, high dose boron implantation and the limited activation of {sup 49}BF{sub 2} due to co-implanted fluorine. In this study, basic characterization of the B{sub 18}H{sub 22} contact implant was performed through sheet resistance, SIMS (Secondary Ion Mass Spectrometry) and XTEM (cross-sectional transmission electron microscopy). The B{sub 18}H{sub 22} implants showed lower sheet resistance than conventional {sup 49}BF{sub 2} for 5x10{sup 15} ions/cm{sup 2} on bare wafer tests. Through XTEM study, we found the activation behavior of both B{sub 18}H{sub 22} and {sup 49}BF{sub 2} were directly related with the amorphous layer thickness and residual defects from low thermal budget anneal. PMOS contact resistance in the sub-70 nm device by B{sub 18}H{sub 22} implantation showed considerable improvement (about 30%), showing B{sub 18}H{sub 22} could replace the BF{sub 2} for contact implant in contact resistance implant.

  5. Plasma Source Ion Implantation of Aluminum and Aluminum Alloys

    NASA Astrophysics Data System (ADS)

    Walter, Kevin Carl

    Three plasma source ion implantation (PSII) schemes applied to three aluminum systems have been studied. Pure aluminum, and aluminum alloys 7075 (Al-Cu-Mg-Zn) and A390 (Al-17Si-Cu-Fe) were (1) argon ion sputter-cleaned and nitrogen-implanted, (2) nitrogen-implanted without sputter -cleaning, and (3) argon-implanted. Nitrogen implantation was performed with the goal of modifying the surface properties by transformation of the surface to aluminum-nitride. Argon implantation was performed with the goal of modifying the surface properties by inducing radiation damage. All implantation schemes were accomplished using a glow discharge mode of the PSII process. Implanted surfaces were investigated using Auger depth profiling and Transmission Electron Microscopy. The profiles indicated a stoichiometric layer, ~ 0.15 μm thick, of AlN on the nitrogen-implanted samples. Electron microscopy confirmed the complete conversion of the aluminum surface to AlN. Knoop microhardness tests showed an increase in surface hardness, especially at low loads. The improvements were independent of prior sputter-cleaning and were approximately equal for the studied aluminum systems. Pin-on-disk wear tests were conducted using a ruby stylus and isopropanol lubrication. Argon implantation decreased the wear resistance of pure aluminum and 7075. Nitrogen implantation improved the wear rates by a factor of ~10 for pure aluminum and 7075. These improvements were independent of prior sputter-cleaning. The coefficient of friction was not significantly influenced by the implantation schemes. Due to a coarse microstructure, tribological tests of ion-implanted A390 were inconclusive. Corrosion studies performed in a 3.5 wt% NaCl solution (seawater) indicated nitrogen implantation gave pure aluminum improved corrosion resistance. The improvement is due to the complete conversion of the aluminum surface to AlN. Because of pre-existing precipitates, the corrosion properties of 7075 and A390 were not

  6. Surface Engineering of Nanostructured Titanium Implants with Bioactive Ions.

    PubMed

    Kim, H-S; Kim, Y-J; Jang, J-H; Park, J-W

    2016-05-01

    Surface nanofeatures and bioactive ion chemical modification are centrally important in current titanium (Ti) oral implants for enhancing osseointegration. However, it is unclear whether the addition of bioactive ions definitively enhances the osteogenic capacity of a nanostructured Ti implant. We systematically investigated the osteogenesis process of human multipotent adipose stem cells triggered by bioactive ions in the nanostructured Ti implant surface. Here, we report that bioactive ion surface modification (calcium [Ca] or strontium [Sr]) and resultant ion release significantly increase osteogenic activity of the nanofeatured Ti surface. We for the first time demonstrate that ion modification actively induces focal adhesion development and expression of critical adhesion–related genes (vinculin, talin, and RHOA) of human multipotent adipose stem cells, resulting in enhanced osteogenic differentiation on the nanofeatured Ti surface. It is also suggested that fibronectin adsorption may have only a weak effect on early cellular events of mesenchymal stem cells (MSCs) at least in the case of the nanostructured Ti implant surface incorporating Sr. Moreover, results indicate that Sr overrides the effect of Ca and other important surface factors (i.e., surface area and wettability) in the osteogenesis function of various MSCs (derived from human adipose, bone marrow, and murine bone marrow). In addition, surface engineering of nanostructured Ti implants using Sr ions is expected to exert additional beneficial effects on implant bone healing through the proper balancing of the allocation of MSCs between adipogenesis and osteogenesis. This work provides insight into the future surface design of Ti dental implants using surface bioactive ion chemistry and nanotopography. PMID:26961491

  7. The Behavior of Ion-Implanted Hydrogen in Gallium Nitride

    SciTech Connect

    Myers, S.M.; Headley, T.J.; Hills, C.R.; Han, J.; Petersen, G.A.; Seager, C.H.; Wampler, W.R.

    1999-01-07

    Hydrogen was ion-implanted into wurtzite-phase GaN, and its transport, bound states, and microstructural effects during annealing up to 980 C were investigated by nuclear-reaction profiling, ion-channeling analysis, transmission electron microscopy, and infrared (IR) vibrational spectroscopy. At implanted concentrations 1 at.%, faceted H{sub 2} bubbles formed, enabling identification of energetically preferred surfaces, examination of passivating N-H states on these surfaces, and determination of the diffusivity-solubility product of the H. Additionally, the formation and evolution of point and extended defects arising from implantation and bubble formation were characterized. At implanted H concentrations 0.1 at.%, bubble formation was not observed, and ion-channeling analysis indicated a defect-related H site located within the [0001] channel.

  8. Nanocrystal formation via yttrium ion implantation into sapphire

    SciTech Connect

    Hunt, E.M.; Hampikian, J.M.; Poker, D.B.

    1995-12-31

    Ion implantation has been used to form nanocrystals in the near surface of single crystal {alpha}-Al{sub 2}O{sub 3}. The ion fluence was 5 x 10{sup 16} Y{sup +}/cm{sup 2}, and the implant energies investigated were 100, 150, and 170 keV. The morphology of the implanted region was investigated using transmission electron microscopy, x-ray energy dispersive spectroscopy, Rutherford backscattering spectroscopy and ion channeling. The implantation causes the formation of an amorphous surface layer which contains spherical nanosized crystals with a diameter of {approximately}13 nm. The nanocrystals are randomly oriented and exhibit a face-centered cubic structure with a lattice parameter of {approximately}4.1 A {+-} .02 A. Preliminary chemical analysis shows that these nanocrystals are rich in aluminum and yttrium and poor in oxygen relative to the amorphous matrix.

  9. Bioactivity of Mg-ion-implanted zirconia and titanium

    NASA Astrophysics Data System (ADS)

    Liang, H.; Wan, Y. Z.; He, F.; Huang, Y.; Xu, J. D.; Li, J. M.; Wang, Y. L.; Zhao, Z. G.

    2007-01-01

    Titanium and zirconia are bioinert materials lacking bioactivity. In this work, surface modification of the two typical biomaterials is conducted by Mg-ion-implantation using a MEVVA ion source in an attempt to increase their bioactivity. Mg ions were implanted into zirconia and titanium with fluences ranging from 1 × 10 17 to 3 × 10 17 ions/cm 2 at 40 keV. The Mg-implanted samples, as well as control (unimplanted) samples, were immersed in SBF for 7 days and then removed to identify the presence of calcium and phosphate (Ca-P) coatings and to characterize their morphology and structure by SEM, XRD, and FT-IR. SEM observations confirm that globular aggregates are formed on the surfaces of the Mg-implanted zirconia and titanium while no precipitates are observed on the control samples. XRD and FT-IR analyses reveal that the deposits are carbonated hydroxyapatite (HAp). Our experimental results demonstrate that Mg-implantation improves the bioactivity of zirconia and titanium. Further, it is found that the degree of bioactivity is adjustable by the ion dose. Mechanisms are proposed to interpret the improvement of bioactivity as a result of Mg implantation and the difference in bioactivity between zirconia and titanium.

  10. Investigation of Donor and Acceptor Ion Implantation in AlN

    SciTech Connect

    Osinsky, Andrei

    2015-09-16

    AlGaN alloys with high Al composition and AlN based electronic devices are attractive for high voltage, high temperature applications, including microwave power sources, power switches and communication systems. AlN is of particular interest because of its wide bandgap of ~6.1eV which is ideal for power electronic device applications in extreme environments which requires high dose ion implantation. One of the major challenges that need to be addressed to achieve full utilization of AlN for opto and microelectronic applications is the development of a doping strategy for both donors and acceptors. Ion implantation is a particularly attractive approach since it allows for selected-area doping of semiconductors due to its high spatial and dose control and its high throughput capability. Active layers in the semiconductor are created by implanting a dopant species followed by very high temperature annealing to reduce defects and thereby activate the dopants. Recovery of implant damage in AlN requires excessively high temperature. In this SBIR program we began the investigation by simulation of ion beam implantation profiles for Mg, Ge and Si in AlN over wide dose and energy ranges. Si and Ge are implanted to achieve the n-type doping, Mg is investigated as a p-type doping. The simulation of implantation profiles were performed in collaboration between NRL and Agnitron using a commercial software known as Stopping and Range of Ions in Matter (SRIM). The simulation results were then used as the basis for ion implantation of AlN samples. The implanted samples were annealed by an innovative technique under different conditions and evaluated along the way. Raman spectroscopy and XRD were used to determine the crystal quality of the implanted samples, demonstrating the effectiveness of annealing in removing implant induced damage. Additionally, SIMS was used to verify that a nearly uniform doping profile was achieved near the sample surface. The electrical characteristics

  11. Nanotubular surface modification of metallic implants via electrochemical anodization technique

    PubMed Central

    Wang, Lu-Ning; Jin, Ming; Zheng, Yudong; Guan, Yueping; Lu, Xin; Luo, Jing-Li

    2014-01-01

    Due to increased awareness and interest in the biomedical implant field as a result of an aging population, research in the field of implantable devices has grown rapidly in the last few decades. Among the biomedical implants, metallic implant materials have been widely used to replace disordered bony tissues in orthopedic and orthodontic surgeries. The clinical success of implants is closely related to their early osseointegration (ie, the direct structural and functional connection between living bone and the surface of a load-bearing artificial implant), which relies heavily on the surface condition of the implant. Electrochemical techniques for modifying biomedical implants are relatively simple, cost-effective, and appropriate for implants with complex shapes. Recently, metal oxide nanotubular arrays via electrochemical anodization have become an attractive technique to build up on metallic implants to enhance the biocompatibility and bioactivity. This article will thoroughly review the relevance of electrochemical anodization techniques for the modification of metallic implant surfaces in nanoscale, and cover the electrochemical anodization techniques used in the development of the types of nanotubular/nanoporous modification achievable via electrochemical approaches, which hold tremendous potential for bio-implant applications. In vitro and in vivo studies using metallic oxide nanotubes are also presented, revealing the potential of nanotubes in biomedical applications. Finally, an outlook of future growth of research in metallic oxide nanotubular arrays is provided. This article will therefore provide researchers with an in-depth understanding of electrochemical anodization modification and provide guidance regarding the design and tuning of new materials to achieve a desired performance and reliable biocompatibility. PMID:25258532

  12. Surface modification of polymeric substrates by plasma-based ion implantation

    NASA Astrophysics Data System (ADS)

    Okuji, S.; Sekiya, M.; Nakabayashi, M.; Endo, H.; Sakudo, N.; Nagai, K.

    2006-01-01

    Plasma-based ion implantation (PBII) as a tool for polymer modification is studied. Polymeric films have good performances for flexible use, such as food packaging or electronic devices. Compared with inorganic rigid materials, polymers generally have large permeability for gases and moisture, which causes packaged contents and devices to degrade. In order to add a barrier function, surface of polymeric films are modified by PBII. One of the advantageous features of this method over deposition is that the modified surface does not have peeling problem. Besides, micro-cracks due to mechanical stress in the modified layer can be decreased. From the standpoint of mass production, conventional ion implantation that needs low-pressure environment of less than 10-3 Pa is not suitable for continuous large-area processing, while PBII works at rather higher pressure of several Pa. In terms of issues mentioned above, PBII is one of the most expected techniques for modification on flexible substrates. However, the mechanism how the barrier function appears by ion implantation is not well explained so far. In this study, various kinds of polymeric films, including polyethyleneterephthalate (PET), are modified by PBII and their barrier characteristics that depend on the ion dose are evaluated. In order to investigate correlations of the barrier function with implanted ions, modified surface is analyzed with X-ray photoelectron spectroscopy (XPS). It is assumed that the diffusion and sorption coefficients are changed by ion implantation, resulting in higher barrier function.

  13. Selective electroless copper plating on silicon seeded by copper ion implantation

    NASA Astrophysics Data System (ADS)

    Bhansali, S.; Sood, D. K.; Zmood, R. B.

    1994-12-01

    We report on the successful use of copper (self) ion implantation into silicon to seed the electroless plating of copper on silicon (100) surfaces. Copper ions were implanted into silicon to doses of 5 times 10(exp 14)-6.4 times 10(exp 16) ions\\sq cm using a metal vapour vacuum arc ion implanter at extraction voltages of 10 kV and 20 kV. A copper film was then deposited onto implanted silicon using a commercial electroless plating solution. The ion energy was kept low enough to facilitate a low critical 'seed' threshold dose which was measured to be 2 times 10(exp 15) Cu ions/sq cm. Test patterns were made using polyimide to study the adaptability of this technique to forming thick structures. Plated films were studied with Rutherford backscattering spectrometry, scanning electron microscopy (SEM), profilometry, energy-dispersive X-rays and Auger electron spectroscopy. The adhesion of films was estimated by a 'Scotch tape test'. The adhesion was found to improve with increasing dose. However, thicker films exhibited rather poor adhesion and high internal stress. Detailed examinations of the top and bottom of the film establish that delamination takes place at the amorphous-crystalline interface of the implanted silicon. SEM results show that the films grow first as isolated islands which become larger and eventually coalesce into a continuous film as the plating time is increased.

  14. Retention of ion-implanted-xenon in olivine: Dependence on implantation dose

    NASA Technical Reports Server (NTRS)

    Melcher, C. L.; Tombrello, T. A.; Burnett, D. S.

    1982-01-01

    The diffusion of Xe in olivine, a major mineral in both meteorites and lunar samples, was studied. Xe ions were implanted at 200 keV into single-crystal synthetic-forsterite targets and the depth profiles were measured by alpha particle backscattering before and after annealing for 1 hour at temperatures up to 1500 C. The fraction of implanted Xe retained following annealing was strongly dependent on the implantation dose. Maximum retention of 100% occurred for an implantion dose of 3 x 10 to the 15th power Xe ions/sq cm. Retention was less at lower doses, with (approximately more than or = 50% loss at one hundred trillion Xe ions/sq cm. Taking the diffusion coefficient at this dose as a lower limit, the minimum activation energy necessary for Xe retention in a 10 micrometer layer for ten million years was calculated as a function of metamorphic temperature.

  15. Lateral displacement induced disorder in L10-FePt nanostructures by ion-implantation

    PubMed Central

    Gaur, N.; Kundu, S.; Piramanayagam, S. N.; Maurer, S. L.; Tan, H. K.; Wong, S. K.; Steen, S. E.; Yang, H.; Bhatia, C. S.

    2013-01-01

    Ion implantation is a promising technique for fabricating high density bit patterned media (BPM) as it may eliminate the requirement of disk planarization. However, there has not been any notable study on the impact of implantation on BPM fabrication of FePt, particularly at nano-scale, where the lateral straggle of implanted ions may become comparable to the feature size. In this work, implantation of antimony ions in patterned and unpatterned L10-FePt thin films has been investigated. Unpatterned films implanted with high fluence of antimony exhibited reduced out-of-plane coercivity and change of magnetic anisotropy from perpendicular direction to film-plane. Interestingly, for samples implanted through patterned masks, the perpendicular anisotropy in the unimplanted region was also lost. This noteworthy observation can be attributed to the displacement of Fe and Pt atoms from the implantation sites to the unimplanted areas, thereby causing a phase disorder transformation from L10 to A1 FePt. PMID:23712784

  16. Influence of Oxygen Ion Implantation on the Damage and Annealing Kinetics of Iron-Implanted Sapphire

    SciTech Connect

    Hunn, J.D.; McHargue, C.J.

    1999-11-14

    The effects of implanted oxygen on the damage accumulation in sapphire which was previously implanted with iron was studied for (0001) sapphire implanted with iron and then with oxygen. The energies were chosen to give similar projected ranges. One series was implanted with a 1:l ratio (4x10{sup 16} ions/cm{sup 2} each) and another with a ratio of 2:3 (4x10{sup 16} fe{sup +}/cm{sup 2}; 6x10{sup 16} O{sup +}/cm{sup 2}). Retained damage, X, in the Al-sublattice, was compared to that produced by implantation of iron alone. The observed disorder was less for the dual implantations suggesting that implantation of oxygen enhanced dynamic recovery during implantation. Samples were annealed for one hour at 800 and 1200 C in an oxidizing and in a reducing atmosphere. No difference was found in the kinetics of recovery in the Al-sublattice between the two dual implant conditions. However, the rate of recovery was different for each from samples implanted with iron alone.

  17. Less-Costly Ion Implantation of Solar Cells

    NASA Technical Reports Server (NTRS)

    Fitzgerald, D. J.

    1984-01-01

    Experiments point way toward more relaxed controls over ion-implanation dosage and uniformity in solar-cell fabrication. Data indicate cell performance, measured by output current density at fixed voltage, virtually same whether implant is particular ion species or broad-beam mixture of several species.

  18. Neuron cell positioning on polystyrene in culture by silver-negative ion implantation and region control of neural outgrowth

    NASA Astrophysics Data System (ADS)

    Tsuji, Hiroshi; Sato, Hiroko; Baba, Takahiro; Ikemura, Shin'ichi; Gotoh, Yasuhito; Ishikawa, Junzo

    2000-05-01

    A new method to control the position of neuron cell attachment and extension region of neural outgrowth has been developed by using a pattering ion implantation with silver-negative ions into polystyrene dishes. This technique offers a promising method to form an artificially designed neural network in cell culture in vitro. Silver-negative ions were implanted into non-treated polystyrene dishes (NTPS) at conditions of 20 keV and 3×1015 ions/cm2 through a pattering mask, which had as many as 67 slits of 60 μm in width and 4 mm in length with a spacing of 60 μm. For cell culture in vitro, nerve cells of PC-12h (rat adrenal phechromocytoma) were used because they respond to a nerve growth factor (NGF). In the first 2 days in culture without NGF, we observed a selective cell attachment only to the ion-implanted region in patterning Ag- implanted polystyrene sample (p-Ag/NTPS). In another 2 days in culture with NGF, the nerve cells expanded neurites only over the ion-implanted region. For collagen-coated p-Ag/NTPS sample of which collagen was coated after the ion implantation (Collagen/p-Ag/NTPS), most nerve cells were also attached on the ion-implanted region. However, neurites expanded in both ion-implanted and unimplanted regions. The contact angle of NTPS decreased after the ion implantation from 86° to 74°. The region selectivity of neuron attachment and neurite extension is considered to be due to contact angle lowering by the ion implantation as radiation effect on the surface.

  19. Thin hydroxyapatite surface layers on titanium produced by ion implantation

    NASA Astrophysics Data System (ADS)

    Baumann, H.; Bethge, K.; Bilger, G.; Jones, D.; Symietz, I.

    2002-11-01

    In medicine metallic implants are widely used as hip replacement protheses or artificial teeth. The biocompatibility is in all cases the most important requirement. Hydroxyapatite (HAp) is frequently used as coating on metallic implants because of its high acceptance by the human body. In this paper a process is described by which a HAp surface layer is produced by ion implantation with a continuous transition to the bulk material. Calcium and phosphorus ions are successively implanted into titanium under different vacuum conditions by backfilling oxygen into the implantation chamber. Afterwards the implanted samples are thermally treated. The elemental composition inside the implanted region was determined by nuclear analysis methods as (α,α) backscattering and the resonant nuclear reaction 1H( 15N,αγ) 12C. The results of X-ray photoelectron spectroscopy indicate the formation of HAp. In addition a first biocompatibility test was performed to compare the growing of marrow bone cells on the implanted sample surface with that of titanium.

  20. Nitrogen and boron ion implantation into electrodeposited hard chrome

    SciTech Connect

    Walter, K.C.; Tesmer, J.R.; Scarborough, W.K.; Woodring, J.S.; Nastasi, M.; Kern, K.T.

    1996-10-01

    Electrodeposited hard chrome was ion implanted with N alone, B alone, and a combination. Separate N and B implantation was done at 75 keV and incident doses of 2, 4, and 8x10{sup 17} at/cm{sup 2}. Samples with both N/B implants used 75 keV and incident dose levels of 4x10{sup 17} N- and B-at/cm{sup 2}. Beam-line system was used. Retained dose was measured using ion beam analysis, which indicated most of the incident dose was retained. Surface hardness, wear coefficient, and friction coefficient were determined by nanohardness indentation and pin-on-disk wear. At a depth of 50 nm, surface hardness increased from 18{+-}1 GPa (unimplanted) to a max of 23{+-}4 GPa for B implant and 26{+-}1 GPa for N implant. the wear coefficient was reduced by 1.3x to 7.4x, depending on implantation. N implant results in lower wear coefficients than B implant.

  1. [Improve wear resistance of UHMWPE by O+ ion implanted].

    PubMed

    Xiong, Dangsheng

    2003-12-01

    Ultra high molecular weight polyethylene (UHMWPE) was implanted with 450 keV and 100 keV O+ ions at dosage of 1 x 10(15)/cm2, 5 x 10(15)/cm2, 3 x 10(14)/cm2, respectively. Its wear behaviors were studied under dry friction condition and lubrication by means of distilled water using a pin-on-disk tribometer with a Si3N4 ceramic ball as a counterface. The wear surfaces were examined with SEM. The experimental results showed that the wear rate of implanted UHMWPE is lower than that of un-implanted UHMWPE under both dry and distilled friction conditions, especially for 450 keV energy and 5 x 10(15)/cm2 dose implantation. The friction coefficient of O+ ions implanted UHMWPE is higher than that of un-implanted UHMWPE under both dry and distilled friction conditions. The adhesive, plow and plastic deformation are the wearing mechanism for un-implanted UHMWPE; the fatigue and abrasive wear are that for implanted UHMWPE. PMID:14716850

  2. A Nanoscale-Localized Ion Damage Josephson Junction Using Focused Ion Beam and Ion Implanter.

    PubMed

    Wu, C H; Ku, W S; Jhan, F J; Chen, J H; Jeng, J T

    2015-05-01

    High-T(c) Josephson junctions were fabricated by nanolithography using focused ion beam (FIB) milling and ion implantation. The junctions were formed in a YBa2Cu3O7-x, thin film in regions defined using a gold-film mask with 50-nm-wide (top) slits, engraved by FIB. The focused ion beam system parameters for dwell time and passes were set to remove gold up to a precise depth. 150 keV oxygen ions were implanted at a nominal dose of up to 5 x 10(13) ions/cm2 into YBa2Cu3O7-x microbridges through the nanoscale slits. The current-voltage curves of the ion implantation junctions exhibit resistive-shunted-junction-like behavior at 77 K. The junction had an approximately linear temperature dependence of critical current. Shapiro steps were observed under microwave irradiation. A 50-nm-wide slit and 0-20-nm-thick buffer layers were chosen in order to make Josephson junctions due to the V-shape of the FIB-milled trench. PMID:26504998

  3. Method and apparatus for plasma source ion implantation

    DOEpatents

    Conrad, J.R.

    1988-08-16

    Ion implantation into surfaces of three-dimensional targets is achieved by forming an ionized plasma about the target within an enclosing chamber and applying a pulse of high voltage between the target and the conductive walls of the chamber. Ions from the plasma are driven into the target object surfaces from all sides simultaneously without the need for manipulation of the target object. Repetitive pulses of high voltage, typically 20 kilovolts or higher, causes the ions to be driven deeply into the target. The plasma may be formed of a neutral gas introduced into the evacuated chamber and ionized therein with ionizing radiation so that a constant source of plasma is provided which surrounds the target object during the implantation process. Significant increases in the surface hardness and wear characteristics of various materials are obtained with ion implantation in this manner. 7 figs.

  4. Method and apparatus for plasma source ion implantation

    DOEpatents

    Conrad, John R.

    1988-01-01

    Ion implantation into surfaces of three-dimensional targets is achieved by forming an ionized plasma about the target within an enclosing chamber and applying a pulse of high voltage between the target and the conductive walls of the chamber. Ions from the plasma are driven into the target object surfaces from all sides simultaneously without the need for manipulation of the target object. Repetitive pulses of high voltage, typically 20 kilovolts or higher, causes the ions to be driven deeply into the target. The plasma may be formed of a neutral gas introduced into the evacuated chamber and ionized therein with ionizing radiation so that a constant source of plasma is provided which surrounds the target object during the implantation process. Significant increases in the surface hardness and wear characteristics of various materials are obtained with ion implantation in this manner.

  5. Luminescence of a titanate compound under europium ion implantation

    NASA Astrophysics Data System (ADS)

    Plantevin, O.; Oliviero, E.; Dantelle, G.; Mayer, L.

    2014-05-01

    The ability to incorporate europium ions in a near-surface layer of a nonlinear optical material KTiOPO4 by ion implantation is reported here. Europium diffusion as well as surface modification were characterized after annealing using RBS. The photoluminescence of the as-implanted samples indicates that the creation of defects gives rise to green visible emission centered about 550 nm. Annealing up to 1000 °C does not allow the oxidation to the 3+ valence state of the europium ion. However it is shown that annealing up to such high temperature gives rise to an intense near infra-red photoluminescence in the range 800-1100 nm in implanted samples at an optimal fluence of 2 × 1013 europium ions/cm2.

  6. High energy metal ion implantation using `Magis`, a novel, broad-beam, Marx-generator-based ion source

    SciTech Connect

    Anders, A.; Brown, I.G.; Dickinson, M.R.; MacGill, R.A.

    1996-08-01

    Ion energy of the beam formed by an ion source is proportional to extractor voltage and ion charge state. Increasing the voltage is difficult and costly for extraction voltage over 100 kV. Here we explore the possibility of increasing the charge states of metal ions to facilitate high-energy, broad beam ion implantation at a moderate voltage level. Strategies to enhance the ion charge state include operating in the regimes of high-current vacuum sparks and short pulses. Using a time-of-flight technique we have measured charge states as high as 7+ (73 kA vacuum spark discharge) and 4+ (14 kA short pulse arc discharge), both for copper, with the mean ion charge states about 6.0 and 2.5, respectively. Pulsed discharges can conveniently be driven by a modified Marx generator, allowing operation of ``Magis`` with a single power supply (at ground potential) for both plasma production and ion extraction.

  7. Anatomically guided implant site preparation technique at molar sites.

    PubMed

    Rodriguez-Tizcareño, Mario H; Bravo-Flores, Claudia

    2009-10-01

    Immediate postextraction implant placement in the areas of multiradicular teeth is a difficult procedure in view of having to place the implant in an ideal position without jeopardizing its initial stability. The surgeon often faces the problem of directing the initial osteotomy in the medial portion of the alveolus with the difficulty of engaging the inter-radicular septum of the extraction socket. The drill may slip continually leading to an inaccurate site preparation, and consequently to a deficient implant insertion. The fixture is often placed directly into either one of the extraction sockets of the tooth to be replaced. The anatomically guided site preparation technique is a very useful tool to perform implant placement in the areas of multiradicular teeth. This approach of implant insertion consists of a progressive preparation of the implant site using the anatomy and geometry of the root of the multiradicular teeth to be extracted as a reference and as an aid to engage the inter-radicular septum. This places the implants in a favorable and proper position from a biomechanical and occlusal standpoint. The objective of this article is to describe the anatomically guided implant site preparation technique as an aid to favorably place dental implants in multiradicular teeth postextraction. PMID:22129957

  8. Osteoconductivity of hydrophilic microstructured titanium implants with phosphate ion chemistry.

    PubMed

    Park, Jin-Woo; Jang, Je-Hee; Lee, Chong Soo; Hanawa, Takao

    2009-07-01

    This study investigated the surface characteristics and bone response of titanium implants produced by hydrothermal treatment using H(3)PO(4), and compared them with those of implants produced by commercial surface treatment methods - machining, acid etching, grit blasting, grit blasting/acid etching or spark anodization. The surface characteristics were evaluated by scanning electron microscopy, thin-film X-ray diffractometry, X-ray photoelectron spectroscopy, contact angle measurement and stylus profilometry. The osteoconductivity of experimental implants was evaluated by removal torque testing and histomorphometric analysis after 6 weeks of implantation in rabbit tibiae. Hydrothermal treatment with H(3)PO(4) and subsequent heat treatment produced a crystalline phosphate ion-incorporated oxide (titanium oxide phosphate hydrate, Ti(2)O(PO(4))(2)(H(2)O)(2); TiP) surface approximately 5microm in thickness, which had needle-like surface microstructures and superior wettability compared with the control surfaces. Significant increases in removal torque forces and bone-to-implant contact values were observed for TiP implants compared with those of the control implants (p<0.001). After thorough cleaning of the implants removed during the removal torque testing, a considerable quantity of attached bone was observed on the surfaces of the TiP implants. PMID:19332400

  9. Oxide formation on NbAl{sub 3} and TiAl due to ion implantation of {sup 18}O

    SciTech Connect

    Hanrahan, R.J. Jr.; Verink, E.D. Jr.; Withrow, S.P.; Ristolainen, E.O.

    1993-12-31

    Surface modification by ion implantation of {sup 18}O ions was investigated as a technique for altering the high-temperature oxidation of aluminide intermetallic compounds and related alloys. Specimens of NbAl{sub 3} and TiAl were implanted to a dose of 1 {times} 10{sup 18} ions/cm{sup 2} at 168 keV. Doses and accelerating energies were calculated to obtain near-stoichiometric concentrations of oxygen. Use of {sup 18}O allowed the implanted oxygen profiles to be measured using secondary ion mass spectroscopy (SIMS). The near surface oxides formed were studied using x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy. Specimens were also examined using x-ray diffraction and SEM. This paper presents results for specimens examined in the as-implanted state. The oxide formed due to implantation is a layer containing a mixture of Nb or Ti and amorphous Al oxides.

  10. Ion/water channels for embryo implantation barrier.

    PubMed

    Liu, Xin-Mei; Zhang, Dan; Wang, Ting-Ting; Sheng, Jian-Zhong; Huang, He-Feng

    2014-05-01

    Successful implantation involves three distinct processes, namely the embryo apposition, attachment, and penetration through the luminal epithelium of the endometrium to establish a vascular link to the mother. After penetration, stromal cells underlying the epithelium differentiate and surround the embryo to form the embryo implantation barrier, which blocks the passage of harmful substances to the embryo. Many ion/water channel proteins were found to be involved in the process of embryo implantation. First, ion/water channel proteins play their classical role in establishing a resting membrane potential, shaping action potentials and other electrical signals by gating the flow of ions across the cell membrane. Second, most of ion/water channel proteins are regulated by steroid hormone (estrogen or progesterone), which may have important implications to the embryo implantation. Last but not least, these proteins do not limit themselves as pure channels but also function as an initiator of a series of consequences once activated by their ligand/stimulator. Herein, we discuss these new insights in recent years about the contribution of ion/water channels to the embryo implantation barrier construction during early pregnancy. PMID:24789983

  11. Fabrication of Genesis Sample Simulants Using Plasma Source Ion Implantation (PSII)

    NASA Technical Reports Server (NTRS)

    Kuhlman, K. R.

    2002-01-01

    Plasma source ion implantation can be used to fabricate simulant samples for the Genesis mission. These simulants will be needed by investigators to validate sample preparation and analysis techniques for the returned Genesis samples. Additional information is contained in the original extended abstract.

  12. Al-O interactions in ion-implanted crystalline silicon

    NASA Astrophysics Data System (ADS)

    Galvagno, G.; La Ferla, A.; Spinella, C.; Priolo, F.; Raineri, V.; Torrisi, Lucio; Rimini, E.; Carnera, A.; Gasparotto, A.

    1994-08-01

    The formation and dissolution of Si-O-Al precipitates have been investigated in Czochralski silicon wafers implanted with 6 MeV Al ions and thermally processed. The data have been compared to the O precipitation in samples implanted with 6 MeV Si or P ions. The amount of precipitated O atoms is about one order of magnitude higher for Al than for Si or P implanted samples. Moreover, a strong gettering of the Al atoms by the silicon dioxide precipitates has been observed. The precipitate evolution has been studied for different annealing times and temperatures. The oxygen precipitation has been simulated by the classical theory of nucleation and growth, with the introduction of new factors that take into account the implant damage distribution, the agglomeration of point defects during the initial stages of the annealing and the oxygen outdiffusion from the sample surface.

  13. Monitoring of ion implantation in microelectronics production environment using multi-channel reflectometry

    NASA Astrophysics Data System (ADS)

    Ebersbach, Peter; Urbanowicz, Adam M.; Likhachev, Dmitry; Hartig, Carsten

    2016-03-01

    Optical metrology techniques such as ellipsometry and reflectometry are very powerful for routine process monitoring and control in the modern semiconductor manufacturing industry. However, both methods rely on optical modeling therefore, the optical properties of all materials in the stack need to be characterized a priori or determined during characterization. Some processes such as ion implantation and subsequent annealing produce slight variations in material properties within wafer, wafer-to-wafer, and lot-to-lot; such variation can degrade the dimensional measurement accuracy for both unpatterned optical measurements as well as patterned (2D and 3D) scatterometry measurements. These variations can be accounted for if the optical model of the structure under investigation allows one to extract not just dimensional but also material information already residing within the optical spectra. This paper focuses on modeling of ion implanted and annealed poly Si stacks typically used in high-k technology. Monitoring of ion implantation is often a blind spot in mass production due to capability issues and other limitations of common methods. Typically, the ion implantation dose can be controlled by research-grade ellipsometers with extended infrared range. We demonstrate that multi-channel spectroscopic reflectometry can also be used for ion implant monitoring in the mass-production environment. Our findings are applicable across all technology nodes.

  14. Laser-driven ion sources for metal ion implantation for the reduction of dry friction

    SciTech Connect

    Boody, F. P.; Juha, L.; Kralikova, B.; Krasa, J.; Laska, L.; Masek, K.; Pfeifer, M.; Rohlena, K.; Skala, J.; Straka, P.; Perina, V.; Woryna, E.; Giersch, D.; Hoepfl, R.; Kelly, J. C.; Hora, H.

    1997-04-15

    The anomalously high ion currents and very high ionization levels of laser-produced plasmas give laser-driven ion sources significant advantages over conventional ion sources. In particular, laser-driven ion sources should provide higher currents of metal ions at lower cost, for implantation into solids in order to improve their material properties such as friction. The energy and charge distributions for Pb and Sn ions produced by ablation of solid targets with {approx}25 J, {approx}300 ps iodine laser pulses, resulting in up to 48-times ionized MeV ions, as well as the optimization of focus position, are presented. Implantation of these ions into Ck-45 steel, without electrostatic acceleration, produced profiles with two regions. Almost all of the ions were implanted in a near surface region a few nm deep. However, a small but significant number of ions were implanted as deep as could be measured with Rutherford backscattering (RBS), here 150 nm for Sn and 250 nm for Pb. For the implanted ion densities and profiles achieved, no change in the coefficient of friction was measured for either ion.

  15. Implant placement in atrophic alveolar ridges: a simplified technique.

    PubMed

    Fugazzotto, P A

    1998-01-01

    A technique is presented that allows for the predictable and simple placement of implants into ideal restorable positions in severely atrophic, knife-edged ridges. Technical considerations and advantages of this treatment approach are discussed. PMID:9823107

  16. Evolution of defects in silicon carbide implanted with helium ions

    NASA Astrophysics Data System (ADS)

    Zhang, Chonghong; Song, Yin; Yang, Yitao; Zhou, Chunlan; Wei, Long; Ma, Hongji

    2014-05-01

    Effects of accumulation of radiation damage in silicon carbide are important concerns for the use of silicon carbide in advanced nuclear energy systems. In the present work lattice damage in silicon carbide crystal (4H type) implanted with 100 keV 4He+ ions was investigated with Rutherford backscattering spectrometry in channeling geometry (RBS/c) and positron beam Doppler broadening spectrometry (PBDB). Helium implantation was performed at the specimen temperature of 510 K to avoid amorphization of the SiC crystal. Fluences of helium ions were selected to be in the range from 1 × 1016 to 3 × 1016 ions cm-2, around the dose threshold for the formation of observable helium bubbles under transmission electron microscopes (TEM). The RBS/c measurements show distinctly different annealing behavior of displaced Si atoms at doses below or above the threshold for helium bubble formation. The RBS/c yield in the peak damage region of the specimen implanted to 3 × 1016 He-ions cm-2 shows an increase on the subsequently thermal annealing above 873 K, which is readily ascribed to the extra displacement of Si atoms due to helium bubble growth. The RBS/c yield in the specimen implanted to a lower ion fluence of 1.5 × 1016 He-ions cm-2 decreases monotonously on annealing from ambient temperatures up to 1273 K. The PBDB measurements supply evidence of clustering of vacancies at temperatures from 510 to 1173 K, and dissociation of vacancy clusters above 1273 K. The similarity of annealing behavior in PBDB profiles for helium implantation to 1 × 1016 and 3 × 1016 ions cm-2 is ascribed to the saturation of trapping of positrons in vacancy type defects in the damaged layers in the specimens helium-implanted to the two dose levels.

  17. Non-Contact Measurement of Thermal Diffusivity in Ion-Implanted Nuclear Materials.

    PubMed

    Hofmann, F; Mason, D R; Eliason, J K; Maznev, A A; Nelson, K A; Dudarev, S L

    2015-01-01

    Knowledge of mechanical and physical property evolution due to irradiation damage is essential for the development of future fission and fusion reactors. Ion-irradiation provides an excellent proxy for studying irradiation damage, allowing high damage doses without sample activation. Limited ion-penetration-depth means that only few-micron-thick damaged layers are produced. Substantial effort has been devoted to probing the mechanical properties of these thin implanted layers. Yet, whilst key to reactor design, their thermal transport properties remain largely unexplored due to a lack of suitable measurement techniques. Here we demonstrate non-contact thermal diffusivity measurements in ion-implanted tungsten for nuclear fusion armour. Alloying with transmutation elements and the interaction of retained gas with implantation-induced defects both lead to dramatic reductions in thermal diffusivity. These changes are well captured by our modelling approaches. Our observations have important implications for the design of future fusion power plants. PMID:26527099

  18. Non-Contact Measurement of Thermal Diffusivity in Ion-Implanted Nuclear Materials

    SciTech Connect

    Hofmann, F.; Mason, D. R.; Eliason, J. K.; Maznev, A. A.; Nelson, K. A.; Dudarev, S. L.

    2015-11-03

    Knowledge of mechanical and physical property evolution due to irradiation damage is essential for the development of future fission and fusion reactors. Ion-irradiation provides an excellent proxy for studying irradiation damage, allowing high damage doses without sample activation. Limited ion-penetration-depth means that only few-micron-thick damaged layers are produced. Substantial effort has been devoted to probing the mechanical properties of these thin implanted layers. Yet, whilst key to reactor design, their thermal transport properties remain largely unexplored due to a lack of suitable measurement techniques. Here we demonstrate non-contact thermal diffusivity measurements in ion-implanted tungsten for nuclear fusion armour. Alloying with transmutation elements and the interaction of retained gas with implantation-induced defects both lead to dramatic reductions in thermal diffusivity. These changes are well captured by our modelling approaches. Our observations have important implications for the design of future fusion power plants.

  19. Non-Contact Measurement of Thermal Diffusivity in Ion-Implanted Nuclear Materials

    DOE PAGESBeta

    Hofmann, F.; Mason, D. R.; Eliason, J. K.; Maznev, A. A.; Nelson, K. A.; Dudarev, S. L.

    2015-11-03

    Knowledge of mechanical and physical property evolution due to irradiation damage is essential for the development of future fission and fusion reactors. Ion-irradiation provides an excellent proxy for studying irradiation damage, allowing high damage doses without sample activation. Limited ion-penetration-depth means that only few-micron-thick damaged layers are produced. Substantial effort has been devoted to probing the mechanical properties of these thin implanted layers. Yet, whilst key to reactor design, their thermal transport properties remain largely unexplored due to a lack of suitable measurement techniques. Here we demonstrate non-contact thermal diffusivity measurements in ion-implanted tungsten for nuclear fusion armour. Alloying withmore » transmutation elements and the interaction of retained gas with implantation-induced defects both lead to dramatic reductions in thermal diffusivity. These changes are well captured by our modelling approaches. Our observations have important implications for the design of future fusion power plants.« less

  20. Non-Contact Measurement of Thermal Diffusivity in Ion-Implanted Nuclear Materials

    PubMed Central

    Hofmann, F.; Mason, D. R.; Eliason, J. K.; Maznev, A. A.; Nelson, K. A.; Dudarev, S. L.

    2015-01-01

    Knowledge of mechanical and physical property evolution due to irradiation damage is essential for the development of future fission and fusion reactors. Ion-irradiation provides an excellent proxy for studying irradiation damage, allowing high damage doses without sample activation. Limited ion-penetration-depth means that only few-micron-thick damaged layers are produced. Substantial effort has been devoted to probing the mechanical properties of these thin implanted layers. Yet, whilst key to reactor design, their thermal transport properties remain largely unexplored due to a lack of suitable measurement techniques. Here we demonstrate non-contact thermal diffusivity measurements in ion-implanted tungsten for nuclear fusion armour. Alloying with transmutation elements and the interaction of retained gas with implantation-induced defects both lead to dramatic reductions in thermal diffusivity. These changes are well captured by our modelling approaches. Our observations have important implications for the design of future fusion power plants. PMID:26527099

  1. Non-Contact Measurement of Thermal Diffusivity in Ion-Implanted Nuclear Materials

    NASA Astrophysics Data System (ADS)

    Hofmann, F.; Mason, D. R.; Eliason, J. K.; Maznev, A. A.; Nelson, K. A.; Dudarev, S. L.

    2015-11-01

    Knowledge of mechanical and physical property evolution due to irradiation damage is essential for the development of future fission and fusion reactors. Ion-irradiation provides an excellent proxy for studying irradiation damage, allowing high damage doses without sample activation. Limited ion-penetration-depth means that only few-micron-thick damaged layers are produced. Substantial effort has been devoted to probing the mechanical properties of these thin implanted layers. Yet, whilst key to reactor design, their thermal transport properties remain largely unexplored due to a lack of suitable measurement techniques. Here we demonstrate non-contact thermal diffusivity measurements in ion-implanted tungsten for nuclear fusion armour. Alloying with transmutation elements and the interaction of retained gas with implantation-induced defects both lead to dramatic reductions in thermal diffusivity. These changes are well captured by our modelling approaches. Our observations have important implications for the design of future fusion power plants.

  2. On carbon nitride synthesis at high-dose ion implantation

    NASA Astrophysics Data System (ADS)

    Romanovsky, E. A.; Bespalova, O. V.; Borisov, A. M.; Goryaga, N. G.; Kulikauskas, V. S.; Sukharev, V. G.; Zatekin, V. V.

    1998-04-01

    Rutherford backscattering spectrometry was used for the study of high dose 35 keV nitrogen ions implantation into graphites and glassy carbon. Quantitative data on depth profiles and its dependencies on irradiation fluence and ion beam density were obtained. The stationary dome-shaped depth profile with maximum nitrogen concentration 22-27 at.% and half-width more than twice exceeding projected range of ions is reached at fluence Φ ˜10 18 cm -2. The dependence of the maximum concentration in the profile on ion current density was studied. The largest concentration was obtained at reduced ion current density.

  3. Optical image storage in ion implanted PLZT ceramics

    SciTech Connect

    Peercy, P. S.; Land, C. E.

    1980-01-01

    Optical images can be stored in transparent lead-lanthanum-zirconate-titanate (PLZT) ceramics by exposure to near-uv light with photon energies greater than the band gas energy of approx. 3.35 eV. The image storage process relies on optically induced changes in the switching properties of ferroelectric domains (photoferroelectric effect). Stored images are nonvolatile but can be erased by uniform uv illumination and simultaneous application of an electric field. Although high quality images, with contrast variations of greater than or equal to 100:1 and spatial resolution of approx. 10 ..mu..m, can be stored using the photoferroelectric effect, relatively high exposure energies (approx. 100 mJ/cm/sup 2/) are required to store these images. This large exposure energy severely limits the range of possible applications of nonvolatile image storage in PLZT ceramics. It was found in H, He, and Ar implanted PLZT that the photosensitivity can be significantly increased by ion implantation into the surface to be exposed. The photosensitivity after implantation with 5 x 10/sup 14/ 500 keV Ar/cm/sup 2/ is increased by about three orders of magnitude over that of unimplanted PLZT. The image storage process and the effect of ion implantation is presented along with a phenomenological model which describes the enhancement in photosensitivity obtained by ion implantation. This model takes into account both light- and ion implantation-induced changes in conductivity and gives quantitative agreement with the measured changes in the coercive voltage with light intensity for ion implanted PLZT.

  4. Analysis of Accumulating Ability of Heavy Metals in Lotus (Nelumbo nucifera) Improved by Ion Implantation

    NASA Astrophysics Data System (ADS)

    Zhang, Jianhua; Wang, Naiyan; Zhang, Fengshou

    2012-05-01

    Heavy metals have seriously contaminated soil and water, and done harm to public health. Academician WANG Naiyan proposed that ion-implantation technique should be exploited for environmental bioremediation by mutating and breeding plants or microbes. By implanting N+ into Taikonglian No.1, we have selected and bred two lotus cultivars, Jingguang No.1 and Jingguang No.2. The present study aims at analyzing the feasibility that irradiation can be used for remediation of soil and water from heavy metals. Compared with parent Taikonglian No.1, the uptaking and accumulating ability of heavy metals in two mutated cultivars was obviously improved. So ion implantation technique can indeed be used in bioremediation of heavy metals in soil and water, but it is hard to select and breed a cultivar which can remedy the soil and water from all the heavy metals.

  5. Structured back gates for high-mobility two-dimensional electron systems using oxygen ion implantation

    NASA Astrophysics Data System (ADS)

    Berl, M.; Tiemann, L.; Dietsche, W.; Karl, H.; Wegscheider, W.

    2016-03-01

    We present a reliable method to obtain patterned back gates compatible with high mobility molecular beam epitaxy via local oxygen ion implantation that suppresses the conductivity of an 80 nm thick silicon doped GaAs epilayer. Our technique was optimized to circumvent several constraints of other gating and implantation methods. The ion-implanted surface remains atomically flat which allows unperturbed epitaxial overgrowth. We demonstrate the practical application of this gating technique by using magneto-transport spectroscopy on a two-dimensional electron system (2DES) with a mobility exceeding 20 × 106 cm2/V s. The back gate was spatially separated from the Ohmic contacts of the 2DES, thus minimizing the probability for electrical shorts or leakage and permitting simple contacting schemes.

  6. Observations of Ag diffusion in ion implanted SiC

    SciTech Connect

    Gerczak, Tyler J.; Leng, Bin; Sridharan, Kumar; Jerry L. Hunter, Jr.; Giordani, Andrew J.; Allen, Todd R.

    2015-03-17

    The nature and magnitude of Ag diffusion in SiC has been a topic of interest in connection with the performance of tristructural isotropic (TRISO) coated particle fuel for high temperature gas-cooled nuclear reactors. Ion implantation diffusion couples have been revisited to continue developing a more complete understanding of Ag fission product diffusion in SiC. Ion implantation diffusion couples fabricated from single crystal 4H-SiC and polycrystalline 3C-SiC substrates and exposed to 1500–1625°C, were investigated in this study by transmission electron microscopy and secondary ion mass spectrometry (SIMS). The high dynamic range of SIMS allowed for multiple diffusion régimes to be investigated, including enhanced diffusion by implantation-induced defects and grain boundary (GB) diffusion in undamaged SiC. Lastly, estimated diffusion coefficients suggest GB diffusion in bulk SiC does not properly describe the release observed from TRISO fuel.

  7. Ion implantation for manufacturing bent and periodically bent crystals

    SciTech Connect

    Bellucci, Valerio; Camattari, Riccardo; Guidi, Vincenzo Mazzolari, Andrea; Paternò, Gianfranco; Lanzoni, Luca

    2015-08-10

    Ion implantation is proposed to produce self-standing bent monocrystals. A Si sample 0.2 mm thick was bent to a radius of curvature of 10.5 m. The sample curvature was characterized by interferometric measurements; the crystalline quality of the bulk was tested by X-ray diffraction in transmission geometry through synchrotron light at ESRF (Grenoble, France). Dislocations induced by ion implantation affect only a very superficial layer of the sample, namely, the damaged region is confined in a layer 1 μm thick. Finally, an elective application of a deformed crystal through ion implantation is here proposed, i.e., the realization of a crystalline undulator to produce X-ray beams.

  8. Ion Implanted Passivated Contacts for Interdigitated Back Contacted Solar Cells

    SciTech Connect

    Young, David L.; Nemeth, William; LaSalvia, Vincenzo; Reedy, Robert; Bateman, Nicholas; Stradins, Pauls

    2015-06-14

    We describe work towards an interdigitated back contacted (IBC) solar cell utilizing ion implanted, passivated contacts. Formation of electron and hole passivated contacts to n-type CZ wafers using tunneling SiO2 and ion implanted amorphous silicon (a-Si) are described. P and B were ion implanted into intrinsic amorphous Si films at several doses and energies. A series of post-implant anneals showed that the passivation quality improved with increasing annealing temperatures up to 900 degrees C. The recombination parameter, Jo, as measured by a Sinton lifetime tester, was Jo ~ 14 fA/cm2 for Si:P, and Jo ~ 56 fA/cm2 for Si:B contacts. The contact resistivity for the passivated contacts, as measured by TLM patterns, was 14 milliohm-cm2 for the n-type contact and 0.6 milliohm-cm2 for the p-type contact. These Jo and pcontact values are encouraging for forming IBC cells using ion implantation to spatially define dopants.

  9. Properties of polyimide, polyetheretherketone and polyethyleneterephthalate implanted by Ni ions to high fluences

    NASA Astrophysics Data System (ADS)

    Malinsky, P.; Mackova, A.; Hnatowicz, V.; Khaibullin, R. I.; Valeev, V. F.; Slepicka, P.; Svorcik, V.; Slouf, M.; Perina, V.

    2012-02-01

    Polyimide (PI), polyetheretherketone (PEEK) and polyethyleneterephthalate (PET) were implanted with 40 keV Ni + ions at RT to the fluences (0.25-1.5) × 10 17 cm -2 at ion current density of 4 μA cm -2. Then some of the samples were annealed at the temperatures close to the polymer glassy transition temperature. Depth profiles of the Ni atoms in the as implanted and annealed samples were determined by RBS method. The profiles in the as implanted samples agree reasonably with those simulated using TRYDIN code. The implanted Ni atoms tend to aggregate into nano-particles, the size and distribution of which was determined from TEM images. The nano-particle size increases with increasing ion fluence. Subsequent annealing leads to a reduction in the nanoparticle size. The surface morphology of the implanted and annealed samples was studied using AFM. The changes in the polymer sheet resistance of the implanted and annealed samples were measured by standard two-point technique. The sheet resistance decreases with increasing temperature of annealing.

  10. From plasma immersion ion implantation to deposition: A historical perspective on principles and trends

    SciTech Connect

    Anders, Andre

    2001-06-14

    Plasma immersion techniques of surface modification are known under a myriad of names. The family of techniques reaches from pure plasma ion implantation, to ion implantation and deposition hybrid modes, to modes that are essentially plasma film deposition with substrate bias. In the most general sense, all plasma immersion techniques have in common that the surface of a substrate (target) is exposed to plasma and that relatively high substrate bias is applied. The bias is usually pulsed. In this review, the roots of immersion techniques are explored, some going back to the 1800s, followed by a discussion of the groundbreaking works of Adler and Conrad in the 1980s. In the 1990s, plasma immersion techniques matured in theoretical understanding, scaling, and the range of applications. First commercial facilities are now operational. Various immersion concepts are compiled and explained in this review. While gas (often nitrogen) ion implantation dominated the early years, film-forming immersion techniques and semiconductor processing gained importance. In the 1980s and 1990s we have seen exponential growth of the field but signs of slowdown are clear since 1998. Nevertheless, plasma immersion techniques have found, and will continue to have, an important place among surface modification techniques.

  11. Vertical silicon waveguide coupler bent by ion implantation.

    PubMed

    Yoshida, Tomoya; Tajima, Syougo; Takei, Ryohei; Mori, Masahiko; Miura, Noboru; Sakakibara, Youichi

    2015-11-16

    We propose and demonstrate that vertically curved waveguides (VCWs) enable vertical coupling between silicon wire waveguides and optical fibers with low wavelength dependence and polarization dependence for wide telecommunication wavelength band light. To bend these VCWs, we implanted silicon ions into silicon wire cantilevers from the vertical direction. The internal stress distribution that was induced by ion implantation drove the bending force, and we achieved vertical bending of the waveguides, with curvature radii ranging from 3 to 25 μm. At a radius of curvature of 6 μm, we obtained a coupling loss of 3 dB using a lens fiber. PMID:26698428

  12. Raman spectroscopy of ion-implanted silicon

    SciTech Connect

    Tuschel, D.D.; Lavine, J.P.

    1997-11-01

    Raman spectroscopy is used to characterize silicon implanted with boron at a dose of 10{sup 14}/cm{sup 2} or less and thermally annealed. The Raman scattering strengths and band shapes of the first-order optical mode at 520 cm{sup {minus}1} and of the second-order phonon modes are investigated to determine which modes are sensitive to the boron implant. The as-implanted samples show diminishing Raman scattering strength as the boron dose increases when the incident laser beam is 60{degree} with respect to the sample normal. Thermal annealing restores some of the Raman scattering strength. Three excitation wavelengths are used and the shortest, 457.9 nm, yields the greatest spectral differences from unimplanted silicon. The backscattering geometry shows a variety of changes in the Raman spectrum upon boron implantation. These involve band shifts of the first-order optical mode, bandwidth variations of the first-order optical mode, and the intensity of the second-order mode at 620 cm{sup {minus}1}.

  13. Ta-ion implantation induced by a high-intensity laser for plasma diagnostics and target preparation

    NASA Astrophysics Data System (ADS)

    Cutroneo, M.; Malinsky, P.; Mackova, A.; Matousek, J.; Torrisi, L.; Slepicka, P.; Ullschmied, J.

    2015-12-01

    The present work is focused on the implantation of Ta ions into silicon substrates covered by a silicon dioxide layer 50-300 nm thick. The implantation is achieved using sub-nanosecond pulsed laser ablation (1015 W/cm2) with the objective of accelerating non-equilibrium plasma ions. The accelerated Ta ions are implanted into the exposed silicon substrates at energies of approximately 20 keV per charge state. By changing a few variables in the laser pulse, it is possible to control the kinetic energy, the yield and the angular distribution of the emitted ions. Rutherford Back-Scattering analysis was performed using 2.0 MeV He+ as the probe ions to determine the elemental depth profiles and the chemical composition of the laser-implanted substrates. The depth distributions of the implanted Ta ions were compared to SRIM 2012 simulations. The evaluated results of energy distribution were compared with online techniques, such as Ion Collectors (IC) and an Ion Energy Analyser (IEA), for a detailed identification of the produced ion species and their energy-to-charge ratios (M/z). Moreover, XPS (X-ray Photon Spectroscopy) and AFM (Atomic Force Microscopy) analyses were carried out to obtain information on the surface morphology and the chemical composition of the modified implanted layers, as these features are important for further application of such structures.

  14. Optical and electrical studies of ZnO thin films heavily implanted with silver ions

    NASA Astrophysics Data System (ADS)

    Lyadov, N. M.; Gumarov, A. I.; Valeev, V. F.; Nuzhdin, V. I.; Khaibullin, R. I.; Faizrakhmanov, I. A.

    2014-12-01

    Thin films of zinc oxide (ZnO) with the thickness of 200 nm have been deposited on quartz substrates by using ion-beam sputtering technique. Then Ag+ ions with the energy of 30 keV have been implanted into as-deposited ZnO films to the fluences in the range of (0.25-1.00)×1017 ions/cm2 to form ZnO:Ag composite layers with different concentrations of the silver impurity. The analysis of the microstructure has shown that the thickness of the ZnO film decreases, and the Ag dopant concentration tends to the saturation with increasing Ag implantation fluence. The ZnO:Ag composite layers reveal the optical selective absorption at the wavelength of the surface plasmon resonance that is typical for silver nanoparticles dispersed in the ZnO matrix. The red shift of the plasmon resonance peak from 480 to 500 nm is observed with the increase in the implantation fluence to 0.75×1017 Ag ions/cm2. Then the absorption peak position starts the backward motion, and the absorption intensity decreases with the subsequent increase in the implantation fluence. The non-monotonic dependence of the absorption peak position on the implantation fluence has been analyzed within of Maxwell Garnet theory and taking into account the strong sputtering of ZnO films during implantation. The ZnO:Ag composite layers exhibit the p-type conductivity indicating that a part of Ag+ ions is in the form of acceptor impurities implanted into the ZnO lattice.

  15. High-precision figure correction of x-ray telescope optics using ion implantation

    NASA Astrophysics Data System (ADS)

    Chalifoux, Brandon; Sung, Edward; Heilmann, Ralf K.; Schattenburg, Mark L.

    2013-09-01

    Achieving both high resolution and large collection area in the next generation of x-ray telescopes requires highly accurate shaping of thin mirrors, which is not achievable with current technology. Ion implantation offers a promising method of modifying the shape of mirrors by imparting internal stresses in a substrate, which are a function of the ion species and dose. This technique has the potential for highly deterministic substrate shape correction using a rapid, low cost process. Wafers of silicon and glass (D-263 and BK-7) have been implanted with Si+ ions at 150 keV, and the changes in shape have been measured using a Shack-Hartmann metrology system. We show that a uniform dose over the surface repeatably changes the spherical curvature of the substrates, and we show correction of spherical curvature in wafers. Modeling based on experiments with spherical curvature correction shows that ion implantation could be used to eliminate higher-order shape errors, such as astigmatism and coma, by using a spatially-varying implant dose. We will report on progress in modelling and experimental tests to eliminate higher-order shape errors. In addition, the results of experiments to determine the thermal and temporal stability of implanted substrates will be reported.

  16. Peculiarities and application perspectives of metal-ion implants in glasses

    SciTech Connect

    Mazzoldi, P.; Gonella, F.; Arnold, G.W.; Battaglin, G.; Bertoncello, R.

    1993-12-31

    Ion implantation in insulators causes modifications in the refractive-index as a result of radiation damage, phase separation, or compound formation. As a consequence, light waveguides may be formed with interesting applications in the field of optoelectronics. Recently implantation of metals ions (e.g. silver, copper, gold, lead,...) showed the possibility of small radii colloidal particles formation, in a thin surface layer of the glass substrate. These particles exhibit an electron plasmon resonance which depends on the optical constants of the implanted metal and on the refractive-index of the glass host. The non-linear optical properties of such colloids, in particular the enhancement of optical Kerr susceptibility, suggest that the, ion implantation technique may play an important role for the production of all-optical switching devices. In this paper an analysis of the state-of-the-art of the research in this field will be presented in the framework of ion implantation in glass physics and chemistry.

  17. A high-energy, high-current ion implantation system

    NASA Astrophysics Data System (ADS)

    Rose, Peter H.; Faretra, Ronald; Ryding, Geoffery

    1985-01-01

    High current (Pre-DepTM) ion implanters, operating at 80 keV, have met a need in the semiconductor industry. For certain processes, higher energies are required, either to penetrate a surface layer or to place the dopant ion at a greater depth. The Eaton/Nova Model NV10-160 Pre-DepTM Ion Implanter has been developed to meet those special needs. Beam currents as high as 10.0 mA are available at energies up to 160 keV for routine production applications. The system has also been qualified for low current, low dose operation (1011 ions cm-2) and this unique versatility provides the Process and Equipment Engineers with a powerful new tool. The Model NV10-160 also utilizes the Nova-designed, double disk interchange processing system to minimize inactive beam time so that wafer throughputs, up to 300 wafers/h, are achievable on a routine basis. DatalockTM, a computer driven implant monitoring system and AT-4, the Nova cassette-to-cassette wafer loader, are available as standard options. As a production machine, the Model NV10-160 with its high throughput capability, will reduce the implant cost per wafer significantly for doses above 10 × 1015 ions/cm2. Performance patterns are now emerging as some twenty-five systems have now been shipped. This paper summarizes the more important characteristics and reviews the major design features of the NV10-160.

  18. Oxygen ion implantation induced microstructural changes and electrical conductivity in Bakelite RPC detector material

    NASA Astrophysics Data System (ADS)

    Kumar, K. V. Aneesh; Ranganathaiah, C.; Kumarswamy, G. N.; Ravikumar, H. B.

    2016-05-01

    In order to explore the structural modification induced electrical conductivity, samples of Bakelite Resistive Plate Chamber (RPC) detector materials were exposed to 100 keV Oxygen ion in the fluences of 1012, 1013, 1014 and 1015 ions/cm2. Ion implantation induced microstructural changes have been studied using Positron Annihilation Lifetime Spectroscopy (PALS) and X-Ray Diffraction (XRD) techniques. Positron lifetime parameters viz., o-Ps lifetime and its intensity shows the deposition of high energy interior track and chain scission leads to the formation of radicals, secondary ions and electrons at lower ion implantation fluences (1012 to1014 ions/cm2) followed by cross-linking at 1015 ions/cm2 fluence due to the radical reactions. The reduction in electrical conductivity of Bakelite detector material is correlated to the conducting pathways and cross-links in the polymer matrix. The appropriate implantation energy and fluence of Oxygen ion on polymer based Bakelite RPC detector material may reduce the leakage current, improves the efficiency, time resolution and thereby rectify the aging crisis of the RPC detectors.

  19. N-Ion-implanted TiO2 photoanodes in quantum dot-sensitized solar cells

    NASA Astrophysics Data System (ADS)

    Sudhagar, P.; Asokan, K.; Ito, E.; Kang, Yong Soo

    2012-03-01

    Hierarchical nanostructured titanium dioxide (TiO2) clumps were fabricated using electrostatic spray with subsequent nitrogen-ion doping by an ion-implantation technique for improvement of energy conversion efficiency for quantum dot-sensitized solar cells (QDSCs). CdSe quantum dots were directly assembled on the produced N-ion-implanted TiO2 photoanodes by chemical bath deposition, and their photovoltaic performance was evaluated in a polysulfide electrolyte with a Pt counter electrode. We found that the photovoltaic performance of TiO2 electrodes was improved by nearly 145% upon N-ion implantation. The efficiency improvement seems to be due to (1) the enhancement of electron transport through the TiO2 layer by inter-particle necking of primary TiO2 particles and (2) an increase in the recombination resistance at TiO2/QD/electrolyte interfaces by healing the surface states or managing the oxygen vacancies upon N-ion doping. Therefore, N-ion-doped photoanodes offer a viable pathway to develop more efficient QD or dye-sensitized solar cells.Hierarchical nanostructured titanium dioxide (TiO2) clumps were fabricated using electrostatic spray with subsequent nitrogen-ion doping by an ion-implantation technique for improvement of energy conversion efficiency for quantum dot-sensitized solar cells (QDSCs). CdSe quantum dots were directly assembled on the produced N-ion-implanted TiO2 photoanodes by chemical bath deposition, and their photovoltaic performance was evaluated in a polysulfide electrolyte with a Pt counter electrode. We found that the photovoltaic performance of TiO2 electrodes was improved by nearly 145% upon N-ion implantation. The efficiency improvement seems to be due to (1) the enhancement of electron transport through the TiO2 layer by inter-particle necking of primary TiO2 particles and (2) an increase in the recombination resistance at TiO2/QD/electrolyte interfaces by healing the surface states or managing the oxygen vacancies upon N-ion doping

  20. Simplified technique for immediate implant insertion into extraction sockets: report of technique and preliminary results.

    PubMed

    Fugazzotto, Paul A

    2002-01-01

    A technique is presented for placement of implants at the time of tooth extraction in the precisely desired positions, regardless of extraction socket morphology. To date, 162 implants have been placed utilizing this technique. One was mobile at uncovery and removed. The other implants have been successfully in function, as defined by the Albrektsson Criteria, for up to 7 years, yielding a cumulative success rate of 99.4%. PMID:11915550

  1. Studies on the surface modification of TiN coatings using MEVVA ion implantation with selected metallic species

    NASA Astrophysics Data System (ADS)

    Ward, L. P.; Purushotham, K. P.; Manory, R. R.

    2016-02-01

    Improvement in the performance of TiN coatings can be achieved using surface modification techniques such as ion implantation. In the present study, physical vapor deposited (PVD) TiN coatings were implanted with Cr, Zr, Nb, Mo and W using the metal evaporation vacuum arc (MEVVA) technique at a constant nominal dose of 4 × 1016 ions cm-2 for all species. The samples were characterized before and after implantation, using Rutherford backscattering (RBS), glancing incident angle X-ray diffraction (GIXRD), atomic force microscopy (AFM) and optical microscopy. Friction and wear studies were performed under dry sliding conditions using a pin-on-disc CSEM Tribometer at 1 N load and 450 m sliding distance. A reduction in the grain size and surface roughness was observed after implantation with all five species. Little variation was observed in the residual stress values for all implanted TiN coatings, except for W implanted TiN which showed a pronounced increase in compressive residual stress. Mo-implanted samples showed a lower coefficient of friction and higher resistance to breakdown during the initial stages of testing than as-received samples. Significant reduction in wear rate was observed after implanting with Zr and Mo ions compared with unimplanted TiN. The presence of the Ti2N phase was observed with Cr implantation.

  2. Modulation Techniques for Biomedical Implanted Devices and Their Challenges

    PubMed Central

    Hannan, Mahammad A.; Abbas, Saad M.; Samad, Salina A.; Hussain, Aini

    2012-01-01

    Implanted medical devices are very important electronic devices because of their usefulness in monitoring and diagnosis, safety and comfort for patients. Since 1950s, remarkable efforts have been undertaken for the development of bio-medical implanted and wireless telemetry bio-devices. Issues such as design of suitable modulation methods, use of power and monitoring devices, transfer energy from external to internal parts with high efficiency and high data rates and low power consumption all play an important role in the development of implantable devices. This paper provides a comprehensive survey on various modulation and demodulation techniques such as amplitude shift keying (ASK), frequency shift keying (FSK) and phase shift keying (PSK) of the existing wireless implanted devices. The details of specifications, including carrier frequency, CMOS size, data rate, power consumption and supply, chip area and application of the various modulation schemes of the implanted devices are investigated and summarized in the tables along with the corresponding key references. Current challenges and problems of the typical modulation applications of these technologies are illustrated with a brief suggestions and discussion for the progress of implanted device research in the future. It is observed that the prime requisites for the good quality of the implanted devices and their reliability are the energy transformation, data rate, CMOS size, power consumption and operation frequency. This review will hopefully lead to increasing efforts towards the development of low powered, high efficient, high data rate and reliable implanted devices. PMID:22368470

  3. Combined Soft and Hard Tissue Peri-Implant Plastic Surgery Techniques to Enhance Implant Rehabilitation: A Case Report

    PubMed Central

    Baltacıoğlu, Esra; Korkmaz, Fatih Mehmet; Bağış, Nilsun; Aydın, Güven; Yuva, Pınar; Korkmaz, Yavuz Tolga; Bağış, Bora

    2014-01-01

    This case report presents an implant-aided prosthetic treatment in which peri-implant plastic surgery techniques were applied in combination to satisfactorily attain functional aesthetic expectations. Peri-implant plastic surgery enables the successful reconstruction and restoration of the balance between soft and hard tissues and allows the option of implant-aided fixed prosthetic rehabilitation. PMID:25489351

  4. Effects of carbon dioxide plasma immersion ion implantation on the electrochemical properties of AZ31 magnesium alloy in physiological environment

    NASA Astrophysics Data System (ADS)

    Xu, Ruizhen; Yang, Xiongbo; Zhang, Xuming; Wang, Mei; Li, Penghui; Zhao, Ying; Wu, Guosong; Chu, Paul K.

    2013-12-01

    Plasma immersion ion implantation (PIII) is conducted to improve the intrinsically poor corrosion properties of biodegradable AZ31 magnesium alloy in the physiological environment. Carbon dioxide is implanted into the samples and X-ray photoelectron spectroscopy and scanning electron microscopy are used to characterize the materials. The corrosion properties are systematically studied by potentiodynamic polarization tests in two simulated physiological environments, namely simulated body fluids and cell culture medium. The plasma-implanted materials exhibit a lower initial corrosion rate. Being a gaseous ion PIII technique, conformal ion implantation into an object with a complex shape such as an orthopedic implant can be easily accomplished and CO2 PIII is a potential method to improve the biological properties of magnesium and its alloys in clinical applications.

  5. Er + medium energy ion implantation into lithium niobate

    NASA Astrophysics Data System (ADS)

    Svecova, B.; Nekvindova, P.; Mackova, A.; Oswald, J.; Vacik, J.; Grötzschel, R.; Spirkova, J.

    2009-05-01

    Erbium-doped lithium niobate (Er:LiNbO3) is a prospective photonics component, operating at 1.5 μm, which could find its use chiefly as an optical amplifier or waveguide laser. In this study, we have focused on the properties of the optically active Er:LiNbO3 layers, which are fabricated by medium energy ion implantation under various experimental conditions. Erbium ions were implanted at energies of 330 and 500 keV with fluences of 1.0 × 1015, 2.5 × 1015 and 1.0 × 1016 cm-2 into LiNbO3 single-crystalline cuts of various orientations. The as-implanted samples were annealed in air at 350 °C for 5 h. The depth distribution and diffusion profiles of the implanted Er were measured by Rutherford Backscattering Spectroscopy (RBS) using 2 MeV He+ ions. The projected range RP and projected range straggling ΔRP were calculated employing the SRIM code. The damage distribution and structural changes were described using the RBS/channelling method. Changes of the lithium concentration depth distribution were studied by Neutron Depth Profiling (NDP). The photoluminescence spectra of the samples were measured to determine whether the emission was in the desired region of 1.5 μm. The obtained data made it possible to reveal the relations between the structural changes of erbium-implanted lithium niobate and its luminescence properties important for photonics applications.

  6. Biologic stability of plasma ion-implanted miniscrews

    PubMed Central

    Cho, Young-Chae; Cha, Jung-Yul; Hwang, Chung-Ju; Park, Young-Chel; Jung, Han-Sung

    2013-01-01

    Objective To gain basic information regarding the biologic stability of plasma ion-implanted miniscrews and their potential clinical applications. Methods Sixteen plasma ion-implanted and 16 sandblasted and acid-etched (SLA) miniscrews were bilaterally inserted in the mandibles of 4 beagles (2 miniscrews of each type per quadrant). Then, 250 - 300 gm of force from Ni-Ti coil springs was applied for 2 different periods: 12 weeks on one side and 3 weeks contralaterally. Thereafter, the animals were sacrificed and mandibular specimens including the miniscrews were collected. The insertion torque and mobility were compared between the groups. The bone-implant contact and bone volume ratio were calculated within 800 µm of the miniscrews and compared between the loading periods. The number of osteoblasts was also quantified. The measurements were expressed as percentages and analyzed by independent t-tests (p < 0.05). Results No significant differences in any of the analyzed parameters were noted between the groups. Conclusions The preliminary findings indicate that plasma ion-implanted miniscrews have similar biologic characteristics to SLA miniscrews in terms of insertion torque, mobility, bone-implant contact rate, and bone volume rate. PMID:23814706

  7. An RFQ accelerator system for MeV ion implantation

    NASA Astrophysics Data System (ADS)

    Hirakimoto, Akira; Nakanishi, Hiroaki; Fujita, Hiroyuki; Konishi, Ikuo; Nagamachi, Shinji; Nakahara, Hiroshi; Asari, Masatoshi

    1989-02-01

    A 4-vane-type Radio-Frequency Quadrupole (RFQ) accelerator system for MeV ion implantation has been constructed and ion beams of boron and nitrogen have been accelerated successfully up to an energy of 1.01 and 1.22 MeV, respectively. The acceleration of phosphorus is now ongoing. The design was performed with two computer codes called SUPERFISH and PARMTEQ. The energy of the accelerated ions was measured by Rutherford backscattering spectroscopy. The obtained values agreed well with the designed ones. Thus we have confirmed the validity of our design and have found the possibility that the present RFQ will break through the production-use difficulty of MeV ion implantation.

  8. MEMS-Based Power Generation Techniques for Implantable Biosensing Applications

    PubMed Central

    Lueke, Jonathan; Moussa, Walied A.

    2011-01-01

    Implantable biosensing is attractive for both medical monitoring and diagnostic applications. It is possible to monitor phenomena such as physical loads on joints or implants, vital signs, or osseointegration in vivo and in real time. Microelectromechanical (MEMS)-based generation techniques can allow for the autonomous operation of implantable biosensors by generating electrical power to replace or supplement existing battery-based power systems. By supplementing existing battery-based power systems for implantable biosensors, the operational lifetime of the sensor is increased. In addition, the potential for a greater amount of available power allows additional components to be added to the biosensing module, such as computational and wireless and components, improving functionality and performance of the biosensor. Photovoltaic, thermovoltaic, micro fuel cell, electrostatic, electromagnetic, and piezoelectric based generation schemes are evaluated in this paper for applicability for implantable biosensing. MEMS-based generation techniques that harvest ambient energy, such as vibration, are much better suited for implantable biosensing applications than fuel-based approaches, producing up to milliwatts of electrical power. High power density MEMS-based approaches, such as piezoelectric and electromagnetic schemes, allow for supplemental and replacement power schemes for biosensing applications to improve device capabilities and performance. In addition, this may allow for the biosensor to be further miniaturized, reducing the need for relatively large batteries with respect to device size. This would cause the implanted biosensor to be less invasive, increasing the quality of care received by the patient. PMID:22319362

  9. Performance improvement of silicon nitride ball bearings by ion implantation. CRADA final report

    SciTech Connect

    Williams, J.M.; Miner, J.

    1998-03-01

    The present report summarizes technical results of CRADA No. ORNL 92-128 with the Pratt and Whitney Division of United Technologies Corporation. The stated purpose of the program was to assess the 3effect of ion implantation on the rolling contact performance of engineering silicon nitride bearings, to determine by post-test analyses of the bearings the reasons for improved or reduced performance and the mechanisms of failure, if applicable, and to relate the overall results to basic property changes including but not limited to swelling, hardness, modulus, micromechanical properties, and surface morphology. Forty-two control samples were tested to an intended runout period of 60 h. It was possible to supply only six balls for ion implantation, but an extended test period goal of 150 h was used. The balls were implanted with C-ions at 150 keV to a fluence of 1.1 {times} 10{sup 17}/cm{sup 2}. The collection of samples had pre-existing defects called C-cracks in the surfaces. As a result, seven of the control samples had severe spalls before reaching the goal of 60 h for an unacceptable failure rate of 0.003/sample-h. None of the ion-implanted samples experienced engineering failure in 150 h of testing. Analytical techniques have been used to characterize ion implantation results, to characterize wear tracks, and to characterize microstructure and impurity content. In possible relation to C-cracks. It is encouraging that ion implantation can mitigate the C-crack failure mode. However, the practical implications are compromised by the fact that bearings with C-cracks would, in no case, be acceptable in engineering practice, as this type of defect was not anticipated when the program was designed. The most important reason for the use of ceramic bearings is energy efficiency.

  10. p type doping of zinc oxide by arsenic ion implantation

    SciTech Connect

    Braunstein, G.; Muraviev, A.; Saxena, H.; Dhere, N.; Richter, V.; Kalish, R.

    2005-11-07

    p type doping of polycrystalline ZnO thin films, by implantation of arsenic ions, is demonstrated. The approach consisted of carrying out the implantations at liquid-nitrogen temperature ({approx}-196 deg. C), followed by a rapid in situ heating of the sample, at 560 deg. C for 10 min, and ex situ annealing at 900 deg. C for 45 min in flowing oxygen. p type conductivity with a hole concentration of 2.5x10{sup 13} cm{sup -2} was obtained using this approach, following implantation of 150 keV 5x10{sup 14} As/cm{sup 2}. A conventional room-temperature implantation of 1x10{sup 15} As/cm{sup 2}, followed by the same ex situ annealing, resulted in n type conductivity with a carrier concentration of 1.7x10{sup 12} cm{sup -2}.

  11. Nanocomposite formed by titanium ion implantation into alumina

    SciTech Connect

    Spirin, R. E.; Salvadori, M. C. Teixeira, F. S.; Sgubin, L. G.; Cattani, M.; Brown, I. G.

    2014-11-14

    Composites of titanium nanoparticles in alumina were formed by ion implantation of titanium into alumina, and the surface electrical conductivity measured in situ as the implantation proceeded, thus generating curves of sheet conductivity as a function of dose. The implanted titanium self-conglomerates into nanoparticles, and the spatial dimensions of the buried nanocomposite layer can thus be estimated from the implantation depth profile. Rutherford backscattering spectrometry was performed to measure the implantation depth profile, and was in good agreement with the calculated profile. Transmission electron microscopy of the titanium-implanted alumina was used for direct visualization of the nanoparticles formed. The measured conductivity of the buried layer is explained by percolation theory. We determine that the saturation dose, φ{sub 0}, the maximum implantation dose for which the nanocomposite material still remains a composite, is φ{sub 0} = 2.2 × 10{sup 16 }cm{sup −2}, and the corresponding saturation conductivity is σ{sub 0} = 480 S/m. The percolation dose φ{sub c}, below which the nanocomposite still has basically the conductivity of the alumina matrix, was found to be φ{sub c} = 0.84 × 10{sup 16 }cm{sup −2}. The experimental results are discussed and compared with a percolation theory model.

  12. Optical properties of K9 glass waveguides fabricated by using carbon-ion implantation

    NASA Astrophysics Data System (ADS)

    Liu, Chun-Xiao; Wei, Wei; Fu, Li-Li; Zhu, Xu-Feng; Guo, Hai-Tao; Li, Wei-Nan; Lin, She-Bao

    2016-07-01

    K9 glass is a material with promising properties that make it attractive for optical devices. Ion implantation is a powerful technique to form waveguides with controllable depth and refractive index profile. In this work, optical planar waveguide structures were fabricated in K9 glasses by using 6.0-MeV C3+-ion implantation with a fluence of 1.0 × 1015 ions/cm2. The effective refractive indices of the guided modes were measured by using a prism-coupling system. The refractive index change in the ion-irradiated region was simulated by using the intensity calculation method. The modal intensity profile of the waveguide was calculated and measured by using the finite difference beam propagation method and the end-face coupling technique, respectively. The transmission spectra before and after the implantation showed that the main absorption band was not influenced by the low fluence dopants. The optical properties of the carbon-implanted K9 glass waveguides show promise for use as integrated photonic devices.

  13. Temperature Activated Diffusion of Radicals through Ion Implanted Polymers.

    PubMed

    Wakelin, Edgar A; Davies, Michael J; Bilek, Marcela M M; McKenzie, David R

    2015-12-01

    Plasma immersion ion implantation (PIII) is a promising technique for immobilizing biomolecules on the surface of polymers. Radicals generated in a subsurface layer by PIII treatment diffuse throughout the substrate, forming covalent bonds to molecules when they reach the surface. Understanding and controlling the diffusion of radicals through this layer will enable efficient optimization of this technique. We develop a model based on site to site diffusion according to Fick's second law with temperature activation according to the Arrhenius relation. Using our model, the Arrhenius exponential prefactor (for barrierless diffusion), D0, and activation energy, EA, for a radical to diffuse from one position to another are found to be 3.11 × 10(-17) m(2) s(-1) and 0.31 eV, respectively. The model fits experimental data with a high degree of accuracy and allows for accurate prediction of radical diffusion to the surface. The model makes useful predictions for the lifetime over which the surface is sufficiently active to covalently immobilize biomolecules and it can be used to determine radical fluence during biomolecule incubation for a range of storage and incubation temperatures so facilitating selection of the most appropriate parameters. PMID:26562064

  14. Making CoSi(2) Layers By Ion Implantation

    NASA Technical Reports Server (NTRS)

    Namavar, Fereydoon

    1994-01-01

    Monolithic photovoltaic batteries containing vertical cells include buried CoSi(2) contact layers. Vertical-junction photovoltaic cells in series fabricated in monolithic structure. N- and p-doped silicon layers deposited epitaxially. The CoSi(2) layers, formed by ion implantation and annealing, serve as thin, low-resistance ohmic contacts between cells.

  15. Extreme Precipitation Strengthening in Ion-Implanted Nickel

    SciTech Connect

    Follstaedt, D.M.; Knapp, J.A.; Myers, S.M.; Petersen, G.A.

    1999-05-03

    Precipitation strengthening of nickel was investigated using ion-implantation alloying and nanoindentation testing for particle separations in the nanometer range and volume fractions extending above 10O/O. Ion implantation of either oxygen alone or oxygen plus aluminum at room temperature was shown to produce substantial strengthening in the ion-treated layer, with yield strengths near 5 GPa in both cases. After annealing to 550"C the oxygen-alone layer loses much of the benefit, with its yield strength reduced to 1.2 GP~ but the dual ion-implanted layer retains a substantially enhanced yield strength of over 4 GPa. Examination by transmission electron f microscopy showed very fine dispersions of 1-5 nm diameter NiO and y-A1203 precipitates in the implanted layers before annealing. The heat treatment at 550"C induced ripening of the NiO particles to sizes ranging from 7 to 20 nm, whereas the more stable ~-A1203 precipitates were little changed. The extreme strengthening we observe is in semiquantitative agreement with predictions based on the application of dispersion-hardening theory to these microstructure.

  16. Isotopic fractionation in low-energy ion implantation

    NASA Astrophysics Data System (ADS)

    Ponganis, K. V.; Graf, T.; Marti, K.

    1997-08-01

    The evolutions of planetary atmospheres and other solar system reservoirs have been affected by a variety of fractionating mechanisms. It has been suggested that one of these mechanisms could be low-energy ion implantation. Bernatowicz and Hagee [1987] showed that Kr and Xe implanted at low energy onto tungsten are fractionated by approximately 1% per amu, favoring the heavy isotopes; we confirm these effects. We have extended these studies to Ar and Ne, using a modified Bayard-Alpert type implanter design of cylindrical symmetry with collector potentials of -40 to -100V, and observe systematically larger mass dependent isotopic fractionation for argon and neon, >=3% per amu and >=4% per amu, respectively. These fractionations scale approximately as Δm/m for all of the noble gases measured, consistent with the findings of Bernatowicz and coworkers. Experimental data at higher energies and predictions by TRIM (Transport of Ions in Matter) code simulations indicate that sticking probabilities may depend upon the mass ratios of projectile and target. Many natural environments for low-energy ion implantation existed in the early solar nebula, such as in dusty plasmas or in the interaction of the bipolar outflow with small grains or in the wind of the early active Sun with accreting planetesimals. Low-energy ions provide viable sources for gas loading onto nebular dust grains; the result is isotopic and elemental fractionation of the projectiles.

  17. Waveguiding properties in Yb:YAG crystals implanted with protons and carbon ions.

    PubMed

    Vázquez, G V; Ramírez, D; Márquez, H; Flores-Romero, E; Rickards, J; Trejo-Luna, R

    2012-08-01

    We report the fabrication and analysis of optical waveguides in Yb:YAG crystals using either proton or carbon ion implantation. Planar waveguides were obtained by implanting the whole surface of the crystals. Channel waveguides were defined using an electroformed mask with apertures of 10, 15, and 20 micrometers in width. The waveguiding properties of the structures were analyzed, showing good light confinement based on the transversal mode distribution and optical transmission measurements. The spectroscopic properties of the Yb ions in the YAG host are preserved after the implantation process, which demonstrates the potential of this technique for tailoring microcomponents for integrated optics applications. In particular, the Yb:YAG waveguides have the potential to operate as miniature lasers. PMID:22859050

  18. n{sup +}/p diodes by ion implantation: Dopant, extended defects, and impurity concerns

    SciTech Connect

    Xu, M.; Venables, D.; Christensen, K.N.; Maher, D.M.

    1995-08-01

    The present study is concerned with the formation of defect structures resulting from phosphorus ion implantation into p-type, <100> silicon and with the rearrangement as well as removal of defect structures following high temperature annealing. The problematic interaction of background impurities with extended defects also is included in this study, as are the non-illuminated and illuminated electrical characteristics of n+/p diodes that are fabricated using ion implantation. Wafers and diodes that are fabricated using a phosphorus planar diffusion technique are run in parallel and serve as the controls. In this contribution, preliminary results for the cases of a 50 keV implant followed by an anneal at 900{degrees}C/30 min and a diffusion at 825{degrees}C/60 min are summarized.

  19. Effect of Surgical Technique on Corneal Implant Performance

    PubMed Central

    Ljunggren, Monika Kozak; Elizondo, Rodolfo A.; Edin, Joel; Olsen, David; Merrett, Kimberley; Lee, Chyan-Jang; Salerud, Göran; Polarek, James; Fagerholm, Per; Griffith, May

    2014-01-01

    Purpose Our aim was to determine the effect of a surgical technique on biomaterial implant performance, specifically graft retention. Methods Twelve mini pigs were implanted with cell-free, 1-ethyl-3-(3-dimethyl aminopropyl) carbodiimide (EDC)/N-hydroxysuccinimide (NHS) cross-linked recombinant human collagen type III (RHCIII) hydrogels as substitutes for donor corneal allografts using overlying sutures with or without human amniotic membrane (HAM) versus interrupted sutures with HAM. The effects of the retention method were compared as well as the effects of collagen concentration (13.7% to 15% RHCIII). Results All implanted corneas showed initial haze that cleared with time, resulting in corneas with optical clarity matching those of untreated controls. Biochemical analysis showed that by 12 months post operation, the initial RHCIII implants had been completely remodeled, as type I collagen, was the major collagenous protein detected, whereas no RHCIII could be detected. Histological analysis showed all implanted corneas exhibited regeneration of epithelial and stromal layers as well as nerves, along with touch sensitivity and tear production. Most neovascularization was seen in corneas stabilized by interrupted sutures. Conclusions This showed that the surgical technique used does have a significant effect on the overall performance of corneal implants, overlying sutures caused less vascularization than interrupted sutures. Translational Relevance Understanding the significance of the suturing technique can aid the selection of the most appropriate procedure when implanting artificial corneal substitutes. The same degree of regeneration, despite a higher collagen content indicates that future material development can progress toward stronger, more resistant implants. PMID:24749003

  20. Dependence of implantation sequence on surface blistering characteristics due to H and He ions co-implanted in silicon

    NASA Astrophysics Data System (ADS)

    Liang, J. H.; Hsieh, H. Y.; Wu, C. W.; Lin, C. M.

    2015-12-01

    This study investigated surface blistering characteristics due to H and He ions co-implanted in silicon at room temperature. The H and He ion energies were 40 and 50 keV, respectively, so that their depth profiles were similar. The total implantation fluence for the H and He ions was 5 × 1016 cm-2 under various fluence fractions in the H ions. The implantation sequences under investigation were He + H and H + He. Dynamic optical microscopy (DOM) was employed in order to dynamically analyze surface blistering characteristics. This study used DOM data to construct so-called time-temperature-transformation (T-T-T) curves to easily predict blistering and crater transformation at specific annealing times and temperatures. The results revealed that the curves of blister initialization, crater initialization, and crater completion in the He + H implant occurred at a lower annealing temperature but with a longer annealing time compared to those in the H + He implant. Furthermore, the threshold annealing temperatures for blister and crater formation in the He + H implant were lower than they were in the H + He implant. The size distributions of the blisters and craters in the He + H implant extended wider than those in the H + He implant. In addition, the He + H implant exhibited larger blisters and craters compared to the ones in the H + He implant. Since the former has a higher percentage of exfoliation area than the latter, it is regarded as the more optimal implantation sequence.

  1. Development of Linear Mode Detection for Top-down Ion Implantation of Low Energy Sb Donors

    NASA Astrophysics Data System (ADS)

    Pacheco, Jose; Singh, Meenakshi; Bielejec, Edward; Lilly, Michael; Carroll, Malcolm

    2015-03-01

    Fabrication of donor spin qubits for quantum computing applications requires deterministic control over the number of implanted donors and the spatial accuracy to within which these can be placed. We present an ion implantation and detection technique that allows us to deterministically implant a single Sb ion (donor) with a resulting volumetric distribution of <10 nm. This donor distribution is accomplished by implanting 30keV Sb into Si which yields a longitudinal straggle of <10 nm and combined with a <50 nm spot size using the Sandia NanoImplanter (nI). The ion beam induced charge signal is collected using a MOS detector that is integrated with a Si quantum dot for transport measurments. This work was performed, in part, at the Center for Integrated Nanotechnologies, a U.S. DOE Office of Basic Energy Sciences user facility. The work was supported by Sandia National Laboratories Directed Research and Development Program. Sandia National Laboratories is a multi-program laboratory operated by Sandia Corporation, a Lockheed-Martin Company, for the U. S. Department of Energy under Contract No. DE-AC04-94AL85000.

  2. High definition surface micromachining of LiNbO 3 by ion implantation

    NASA Astrophysics Data System (ADS)

    Chiarini, M.; Bentini, G. G.; Bianconi, M.; De Nicola, P.

    2010-10-01

    High Energy Ion Implantation (HEII) of both medium and light mass ions has been successfully applied for the surface micromachining of single crystal LiNbO 3 (LN) substrates. It has been demonstrated that the ion implantation process generates high differential etch rates in the LN implanted areas, when suitable implantation parameters, such as ion species, fluence and energy, are chosen. In particular, when traditional LN etching solutions are applied to suitably ion implanted regions, etch rates values up to three orders of magnitude higher than the typical etching rates of the virgin material, are registered. Further, the enhancement in the etching rate has been observed on x, y and z-cut single crystalline material, and, due to the physical nature of the implantation process, it is expected that it can be equivalently applied also to substrates with different crystallographic orientations. This technique, associated with standard photolithographic technologies, allows to generate in a fast and accurate way very high aspect ratio relief micrometric structures on LN single crystal surface. In this work a description of the developed technology is reported together with some examples of produced micromachined structures: in particular very precisely defined self sustaining suspended structures, such as beams and membranes, generated on LN substrates, are presented. The developed technology opens the way to actual three dimensional micromachining of LN single crystals substrates and, due to the peculiar properties characterising this material, (pyroelectric, electro-optic, acousto-optic, etc.), it allows the design and the production of complex integrated elements, characterised by micrometric features and suitable for the generation of advanced Micro Electro Optical Systems (MEOS).

  3. Versatile, high-sensitivity faraday cup array for ion implanters

    DOEpatents

    Musket, Ronald G.; Patterson, Robert G.

    2003-01-01

    An improved Faraday cup array for determining the dose of ions delivered to a substrate during ion implantation and for monitoring the uniformity of the dose delivered to the substrate. The improved Faraday cup array incorporates a variable size ion beam aperture by changing only an insertable plate that defines the aperture without changing the position of the Faraday cups which are positioned for the operation of the largest ion beam aperture. The design enables the dose sensitivity range, typically 10.sup.11 -10.sup.18 ions/cm.sup.2 to be extended to below 10.sup.6 ions/cm.sup.2. The insertable plate/aperture arrangement is structurally simple and enables scaling to aperture areas between <1 cm.sup.2 and >750 cm.sup.2, and enables ultra-high vacuum (UHV) applications by incorporation of UHV-compatible materials.

  4. The effects of swift heavy-ion irradiation on helium-ion-implanted silicon

    NASA Astrophysics Data System (ADS)

    Li, B. S.; Du, Y. Y.; Wang, Z. G.; Shen, T. L.; Li, Y. F.; Yao, C. F.; Sun, J. R.; Cui, M. H.; Wei, K. F.; Zhang, H. P.; Shen, Y. B.; Zhu, Y. B.; Pang, L. L.

    2014-10-01

    Cross-sectional transmission electron microscopy (XTEM) was used to study the effects of irradiation with swift heavy ions on helium-implanted silicon. <1 0 0>-oriented silicon wafers were implanted with 30 keV helium to a dose of 3 × 1016 He+/cm2 at 600 K. Subsequently, the helium-implanted Si wafers were irradiated with 792 MeV argon ions. The He bubbles and extended defects in the wafers were examined via XTEM analysis. The results reveal that the mean diameter of the He bubbles increases upon Ar-ion irradiation, while the number density of the He bubbles decreases. The microstructure of the He bubbles observed after Ar-ion irradiation is comparable to that observed after annealing at 1073 K for 30 min. Similarly, the mean size of the extended defects, i.e., Frank loops, increases after Ar-ion irradiation. Possible mechanisms are discussed.

  5. A technique for fabricating single screw-retained implant-supported interim crowns in conjunction with implant surgery.

    PubMed

    McRory, M Eric; Cagna, David R

    2014-06-01

    This article presents an intraoral technique for fabricating single screw-retained implant-supported interim crowns immediately after surgical implant placement in extraction sites. The technique may be used with any implant system that provides a provisional abutment or an open-tray impression coping that can be modified for use as a provisional abutment. PMID:24461941

  6. Resonance ionization of holmium for ion implantation in microcalorimeters

    NASA Astrophysics Data System (ADS)

    Schneider, F.; Chrysalidis, K.; Dorrer, H.; Düllmann, Ch. E.; Eberhardt, K.; Haas, R.; Kieck, T.; Mokry, C.; Naubereit, P.; Schmidt, S.; Wendt, K.

    2016-06-01

    The determination of the electron neutrino mass by calorimetric measurement of the 163 Ho electron capture spectrum requires ultra-pure samples. Several collaborations, like ECHo or HOLMES, intend to employ microcalorimeters into which 163 Ho is implanted as an ion beam. This makes a selective and additionally very efficient ion source for holmium mandatory. For this purpose, laser resonance ionization of stable holmium 165 Ho was studied, using a three step excitation scheme driven by pulsed Ti:sapphire lasers. Five measurements with sample sizes of 1014 and 1015 atoms were performed for the efficiency investigation. In average, an excellent ionization efficiency of 32(5) % could be shown, demonstrating the suitability for ion beam implantation.

  7. Photographic-image storage in ion-implanted PLZT ceramics

    SciTech Connect

    Peercy, P.C.; Land, C.E.

    1982-01-01

    Photographic images can be stored in transparent lead lanthanum zirconate titanate (PLZT) ceramics using near-UV light with photon energies near the band gap energy of 3.42 eV. Coimplanting inert ions, e.g., Ar, Ne and He, into the surface exposed to image light can increase near-UV photosensitivity by a factor of almost 10/sup 4/, with no degradation of image quality, so that the exposure energy threshold is reduced from approx. 100 mJ/cm/sup 2/ to approx. 10 ..mu..Jcm/sup 2/. Coimplanting chemically active and inert ions, e.g., Al or Cr and Ne, can result in similar improvement of the extrinsic (visible light) photosensitivity and in an essentially flat photoresponse from about 400 to 600 nm. In addition, thermal diffusion of Al followed by Ne implantation yield photosensitivity increases in the near-UV comparable to the best results obtained to date with ion implantation.

  8. Characterization of carbon ion implantation induced graded microstructure and phase transformation in stainless steel

    SciTech Connect

    Feng, Kai; Wang, Yibo; Li, Zhuguo; Chu, Paul K.

    2015-08-15

    Austenitic stainless steel 316L is ion implanted by carbon with implantation fluences of 1.2 × 10{sup 17} ions-cm{sup −} {sup 2}, 2.4 × 10{sup 17} ions-cm{sup −} {sup 2}, and 4.8 × 10{sup 17} ions-cm{sup −} {sup 2}. The ion implantation induced graded microstructure and phase transformation in stainless steel is investigated by X-ray diffraction, X-ray photoelectron spectroscopy and high resolution transmission electron microscopy. The corrosion resistance is evaluated by potentiodynamic test. It is found that the initial phase is austenite with a small amount of ferrite. After low fluence carbon ion implantation, an amorphous layer and ferrite phase enriched region underneath are formed. Nanophase particles precipitate from the amorphous layer due to energy minimization and irradiation at larger ion implantation fluence. The morphology of the precipitated nanophase particles changes from circular to dumbbell-like with increasing implantation fluence. The corrosion resistance of stainless steel is enhanced by the formation of amorphous layer and graphitic solid state carbon after carbon ion implantation. - Highlights: • Carbon implantation leads to phase transformation from austenite to ferrite. • The passive film on SS316L becomes thinner after carbon ion implantation. • An amorphous layer is formed by carbon ion implantation. • Nanophase precipitate from amorphous layer at higher ion implantation fluence. • Corrosion resistance of SS316L is improved by carbon implantation.

  9. Ion plating technique improves thin film deposition

    NASA Technical Reports Server (NTRS)

    Mattox, D. M.

    1968-01-01

    Ion plating technique keeps the substrate surface clean until the film is deposited, allows extensive diffusion and chemical reaction, and joins insoluble or incompatible materials. The technique involves the deposition of ions on the substrate surface while it is being bombarded with inert gas ions.

  10. III-Nitride ion implantation and device processing

    SciTech Connect

    Zolper, J.C.; Shul, R.J.; Baca, A.G.; Pearton, S.J.; Abernathy, C.R.; Wilson, R.G.; Stall, R.A.; Shur, M.

    1996-06-01

    Ion implantation doping and isolation has played a critical role in realizing high performance photonic and electronic devices in all mature semiconductor materials; this is also expected for binary III-Nitride materials (InN, GaN, AlN) and their alloys as epitaxy improves and more advanced device structures fabricated. This paper reports on recent progress in ion implantation doping of III-Nitride materials that has led to the first demonstration of a GaN JFET (junction field effect transistor). The JFET was fabricated with all ion implantation doping; in particular, p-type doping of GaN with Ca has been demonstrated with an estimated acceptor ionization energy of 169 meV. O-implantation has also been studied and shown to yield n-type conduction with an ionization energy of {similar_to}29 meV. Neither Ca or O display measurable redistribution during a 1125 C, 15 s activation anneal which sets an upper limit on their diffusivity at this temperature of 2.7{times}10{sup {minus}13}cm{sup 2}/s.

  11. Miniaturized EAPs with compliant electrodes fabricated by ion implantation

    NASA Astrophysics Data System (ADS)

    Shea, H.

    2011-04-01

    Miniaturizing dielectric electroactive polymer (EAP) actuators will lead to highly-integrated mechanical systems on a chip, combining dozens to thousands of actuators and sensors on a few cm2. We present here µm to mm scale electroactive polymer (EAP) devices, batch fabricated on the chip or wafer scale, based on ion-implanted electrodes. Low-energy (2-10 keV) implantation of gold ions into a silicone elastomer leads to compliant stretchable electrodes consisting of a buried 20 nm thick layer of gold nanoparticles in a silicone matrix. These electrodes: 1) conduct at strains up to 175%, 2) are patternable on the µm scale, 3) have stiffness similar to silicone, 4) have good conductivity, and 5) excellent adhesion since implanted in the silicone. The EAP devices consist of 20 to 30 µm thick silicone membranes with µm to mm-scale ion-implanted electrodes on both sides, bonded to a holder. Depending on electrode shape and membrane size, several actuation modes are possible. Characterization of 3mm diameter bi-directional buckling mode actuators, mm-scale tunable lens arrays, 2-axis beam steering mirrors, as well as arrays of 72 cell-size (100x200 µm2) actuators to apply mechanical strain to single cells are reported. Speeds of up to several kHz are observed.

  12. Xenon diffusion following ion implantation into feldspar - Dependence on implantation dose

    NASA Technical Reports Server (NTRS)

    Melcher, C. L.; Burnett, D. S.; Tombrello, T. A.

    1982-01-01

    The diffusion properties of xenon implanted into feldspar, a major mineral in meteorites and lunar samples, are investigated in light of the importance of xenon diffusion in the interpretation of early solar system chronologies and the retention time of solar-wind-implanted Xe. Known doses of Xe ions were implanted at an energy of 200 keV into single-crystal plagioclase targets, and depth profiles were measured by alpha particle backscattering before and after annealing for one hour at 900 or 1000 C. The fraction of Xe retained following annealing is found to be strongly dependent on implantation dose, being greatest at a dose of 3 x 10 to the 15th ions/sq cm and decreasing at higher and lower doses. Xe retention is also observed to be unaffected by two-step anneals, or by implantation with He or Ar. Three models of the dose-dependent diffusion properties are considered, including epitaxial crystal regrowth during annealing controlled by the extent of radiation damage, the creation of trapping sites by radiation damage, and the inhibition of recrystallization by Xe during annealing

  13. Microwave annealing of ion implanted 6H-SiC

    SciTech Connect

    Gardner, J.A.; Rao, M.V.; Tian, Y.L.; Holland, O.W.; Kelner, G.; Freitas, J.A. Jr.; Ahmad, I.

    1996-12-31

    Microwave rapid thermal annealing has been utilized to remove the lattice damage caused by nitrogen(N) ion-implantation as well as to activate the dopant in 6H-SiC. Samples were annealed at temperatures as high as 1,400 C, for 10 min. Van der Pauw Hall measurements indicate an implant activation of 36%, which is similar to the value obtained for the conventional furnace annealing at 1,600 C. Good lattice quality restoration was observed in the Rutherford backscattering and photoluminescence spectra.

  14. Microwave annealing of ion implanted 6H-SiC

    SciTech Connect

    Gardner, J.A.; Rao, M.V.; Tian, Y.L.; Holland, O.W.; Kelner, G.; Freitas, J.A. Jr.; Ahmad, I.

    1996-05-01

    Microwave rapid thermal annealing has been utilized to remove the lattice damage caused by nitrogen (N) ion-implantation as well as to activate the dopant in 6H-SiC. Samples were annealed at temperatures as high as 1,400 C, for 10 min. Van der Pauw Hall measurements indicate an implant activation of 36%, which is similar to the value obtained for the conventional furnace annealing at 1,600 C. Good lattice quality restoration was observed in the Rutherford backscattering and photoluminescence spectra.

  15. Engineering single photon emitters by ion implantation in diamond.

    PubMed

    Naydenov, B; Kolesov, R; Batalov, A; Meijer, J; Pezzagna, S; Rogalla, D; Jelezko, F; Wrachtrup, J

    2009-11-01

    Diamond provides unique technological platform for quantum technologies including quantum computing and communication. Controlled fabrication of optically active defects is a key element for such quantum toolkit. Here we report the production of single color centers emitting in the blue spectral region by high energy implantation of carbon ions. We demonstrate that single implanted defects show sub-poissonian statistics of the emitted photons and can be explored as single photon source in quantum cryptography. Strong zero phonon line at 470.5 nm allows unambiguous identification of this defect as interstitial-related TR12 color center. PMID:19956415

  16. Ion implantation and diamond-like coatings of aluminum alloys

    SciTech Connect

    Malaczynski, G.W.; Hamdi, A.H.; Elmoursi, A.A.; Qiu, X.

    1997-04-01

    In an attempt to increase the wear resistance of some key automotive components, General Motors Research and Development Center initiated a study to determine the potential of surface modification as a means of improving the tribological properties of automotive parts, and to investigate the feasibility of mass producing such parts. This paper describes the plasma immersion ion implantation system that was designed for the study of various options for surface treatment, and it discusses bench testing procedures used for evaluating the surface-treated samples. In particular, both tribological and microstructural analyses are discussed for nitrogen implants and diamond-like hydrocarbon coatings of some aluminum alloys.

  17. Industrial hygiene and control technology assessment of ion implantation operations.

    PubMed

    Ungers, L J; Jones, J H

    1986-10-01

    Ion implantation is a process used to create the functional units (pn junctions) of integrated circuits, photovoltaic (solar) cells and other semiconductor devices. During the process, ions of an impurity or a "dopant" material are created, accelerated and imbedded in wafers of silicon. Workers responsible for implantation equipment are believed to be at risk from exposure to both chemical (dopant compounds) and physical (ionizing radiation) agents. In an effort to characterize the chemical exposures, monitoring for chemical hazards was conducted near eleven ion implanters at three integrated circuit facilities, while ionizing radiation was monitored near four of these units at two of the facilities. The workplace monitoring suggests that ion implantation operators routinely are exposed to low-level concentrations of dopants. Although the exact nature of dopant compounds released to the work environment was not determined, area and personal samples taken during normal operating activities found concentrations of arsenic, boron and phosphorous below OSHA Permissible Exposure Limits (PELs) for related compounds; area samples collected during implanter maintenance activities suggest that a potential exists for more serious exposures. The results of badge dosimetry monitoring for ionizing radiation indicate that serious exposures are unlikely to occur while engineering controls remain intact. All emissions were detected at levels unlikely to result in exposures above the OSHA standard for the whole body (1.25 rems per calendar quarter). The success of existing controls in preventing worker exposures is discussed. Particular emphasis is given to the differential exposures likely to be experienced by operators and maintenance personnel.(ABSTRACT TRUNCATED AT 250 WORDS) PMID:3776837

  18. An experiment on the dynamics of ion implantation and sputtering of surfaces

    SciTech Connect

    Wright, G. M.; Barnard, H. A.; Kesler, L. A.; Peterson, E. E.; Stahle, P. W.; Sullivan, R. M.; Whyte, D. G.; Woller, K. B.

    2014-02-15

    A major impediment towards a better understanding of the complex plasma-surface interaction is the limited diagnostic access to the material surface while it is undergoing plasma exposure. The Dynamics of ION Implantation and Sputtering Of Surfaces (DIONISOS) experiment overcomes this limitation by uniquely combining powerful, non-perturbing ion beam analysis techniques with a steady-state helicon plasma exposure chamber, allowing for real-time, depth-resolved in situ measurements of material compositions during plasma exposure. Design solutions are described that provide compatibility between the ion beam analysis requirements in the presence of a high-intensity helicon plasma. The three primary ion beam analysis techniques, Rutherford backscattering spectroscopy, elastic recoil detection, and nuclear reaction analysis, are successfully implemented on targets during plasma exposure in DIONISOS. These techniques measure parameters of interest for plasma-material interactions such as erosion/deposition rates of materials and the concentration of plasma fuel species in the material surface.

  19. Highly tunable formation of nitrogen-vacancy centers via ion implantation

    SciTech Connect

    Sangtawesin, S.; Brundage, T. O.; Atkins, Z. J.; Petta, J. R.

    2014-08-11

    We demonstrate highly tunable formation of nitrogen-vacancy (NV) centers using 20 keV {sup 15}N{sup +} ion implantation through arrays of high-resolution apertures fabricated with electron beam lithography. By varying the aperture diameters from 80 to 240 nm, as well as the average ion fluences from 5×10{sup 10} to 2 × 10{sup 11} ions/cm{sup 2}, we can control the number of ions per aperture. We analyze the photoluminescence on multiple sites with different implantation parameters and obtain ion-to-NV conversion yields of 6%–7%, consistent across all ion fluences. The implanted NV centers have spin dephasing times T{sub 2}{sup *} ∼ 3 μs, comparable to naturally occurring NV centers in high purity diamond with natural abundance {sup 13}C. With this technique, we can deterministically control the population distribution of NV centers in each aperture, allowing for the study of single or coupled NV centers and their integration into photonic structures.

  20. The Phenomenology of Ion Implantation-Induced Blistering and Thin-Layer Splitting in Compound Semiconductors

    NASA Astrophysics Data System (ADS)

    Singh, R.; Christiansen, S. H.; Moutanabbir, O.; Gösele, U.

    2010-10-01

    Hydrogen and/or helium implantation-induced surface blistering and layer splitting in compound semiconductors such as InP, GaAs, GaN, AlN, and ZnO are discussed. The blistering phenomenon depends on many parameters such as the semiconductor material, ion fluence, ion energy, and implantation temperature. The optimum values of these parameters for compound semiconductors are presented. The blistering and splitting processes in silicon have been studied in detail, motivated by the fabrication of the widely used silicon-on-insulator wafers. Hence, a comparison of the blistering process in Si and compound semiconductors is also presented. This comparative study is technologically relevant since ion implantation-induced layer splitting combined with direct wafer bonding in principle allows the transfer of any type of semiconductor layer onto any foreign substrate of choice—the technique is known as the ion-cut or Smart-Cut™ method. For the aforementioned compound semiconductors, investigations regarding layer transfer using the ion-cut method are still in their infancy. We report feasibility studies of layer transfer by the ion-cut method for some of the most important and widely used compound semiconductors. The importance of characteristic values for successful wafer bonding such as wafer bow and surface flatness as well as roughness are discussed, and difficulties in achieving some of these values are pointed out.

  1. Operations manual for the plasma source ion implantation economics program

    SciTech Connect

    Bibeault, M.L.; Thayer, G.R.

    1995-10-01

    Plasma Source Ion Implantation (PSII) is a surface modification technique for metal. PSIICOSTMODEL95 is an EXCEL-based program that estimates the cost for implementing a PSII system in a manufacturing setting where the number of parts to be processed is over 5,000 parts per day and the shape of each part does not change from day to day. Overall, the manufacturing process must be very well defined and should not change. This document is a self-contained manual for PSIICOSTMODEL95. It assumes the reader has some general knowledge of the technical requirements for PSII. Configuration of the PSII process versus design is used as the methodology in PSIICOSTMODEL95. The reason behind this is twofold. First, the design process cannot be programmed into a computer when the relationships between design variables are not understood. Second, the configuration methodology reduces the number of assumptions that must be programmed into our software. Misuse of results are less likely to occur if the user has fewer assumptions to understand.

  2. Effects of ion-implanted C on the microstructure and surface mechanical properties of Fe alloys implanted with Ti

    NASA Astrophysics Data System (ADS)

    Follstaedt, D. M.; Knapp, J. A.; Pope, L. E.; Yost, F. G.; Picraux, S. T.

    1984-09-01

    The microstructural and tribological effects of ion implanting C into Ti-implanted, Fe-based alloys are examined and compared to the influence of C introduced by vacuum carburization during Ti implantation alone. The amorphous surface alloy formed by Ti implantation of pure Fe increases in thickness when additional C is implanted at depths containing Ti but beyond the range of carburization. Pin-on-disc tests of 15-5 PH stainless steel show that implantation of both Ti and C reduces friction significantly under conditions where no reduction is obtained by Ti implantation alone; wear depths are also less when C is implanted. All available experimental results can be accounted for by consideration of the thickness and Ti concentration of the amorphous Fe-Ti-C alloy. The thicker amorphous layer on samples implanted with additional C extends tribological benefits to more severe wear regimes.

  3. Material synthesis for silicon integrated-circuit applications using ion implantation

    NASA Astrophysics Data System (ADS)

    Lu, Xiang

    As devices scale down into deep sub-microns, the investment cost and complexity to develop more sophisticated device technologies have increased substantially. There are some alternative potential technologies, such as silicon-on-insulator (SOI) and SiGe alloys, that can help sustain this staggering IC technology growth at a lower cost. Surface SiGe and SiGeC alloys with germanium peak composition up to 16 atomic percent are formed using high-dose ion implantation and subsequent solid phase epitaxial growth. RBS channeling spectra and cross-sectional TEM studies show that high quality SiGe and SiGeC crystals with 8 atomic percent germanium concentration are formed at the silicon surface. Extended defects are formed in SiGe and SiGeC with 16 atomic percent germanium concentration. X-ray diffraction experiments confirm that carbon reduces the lattice strain in SiGe alloys but without significant crystal quality improvement as detected by RBS channeling spectra and XTEM observations. Separation by plasma implantation of oxygen (SPIMOX) is an economical method for SOI wafer fabrication. This process employs plasma immersion ion implantation (PIII) for the implantation of oxygen ions. The implantation rate for Pm is considerably higher than that of conventional implantation. The feasibility of SPIMOX has been demonstrated with successful fabrication of SOI structures implementing this process. Secondary ion mass spectrometry (SIMS) analysis and cross-sectional transmission electron microscopy (XTEM) micrographs of the SPIMOX sample show continuous buried oxide under single crystal overlayer with sharp silicon/oxide interfaces. The operational phase space of implantation condition, oxygen dose and annealing requirement has been identified. Physical mechanisms of hydrogen induced silicon surface layer cleavage have been investigated using a combination of microscopy and hydrogen profiling techniques. The evolution of the silicon cleavage phenomenon is recorded by a series

  4. Investigation of dose uniformity on the inner races of bearings treated by plasma immersion ion implantation

    NASA Astrophysics Data System (ADS)

    Zeng, Z. M.; Kwok, T. K.; Tian, X. B.; Tang, B. Y.; Chu, P. K.

    1999-07-01

    Plasma immersion ion implantation (PIII) is an effective technique for the surface modification of industrial components possessing an irregular shape. We have recently used PIII to treat a real industrial ball bearing to enhance the surface properties of the race surface on which the balls roll. The implantation dose uniformity along the groove is assessed using theoretical simulation and experiments. The two sets of results agree very well, showing larger doses near the center. However, the highest dose is not observed at the bottom or center of the groove, but rather offset toward the side close to the sample platen when the bearing is placed horizontally. The minimum dose is observed near the edge or corner of the groove and our model indicates that it is due to the more glancing ion incidence as a result of the evolution of the ion sheath near the corner. The dose nonuniformity along the groove surface is about 40% based on our experimental data.

  5. Coupling of a locally implanted rare-earth ion ensemble to a superconducting micro-resonator

    SciTech Connect

    Wisby, I. Tzalenchuk, A. Ya.; Graaf, S. E. de; Adamyan, A.; Kubatkin, S. E.; Gwilliam, R.; Meeson, P. J.; Lindström, T.

    2014-09-08

    We demonstrate the coupling of rare-earth ions locally implanted in a substrate (Gd{sup 3+} in Al{sub 2}O{sub 3}) to a superconducting NbN lumped-element micro-resonator. The hybrid device is fabricated by a controlled ion implantation of rare-earth ions in well-defined micron-sized areas, aligned to lithographically defined micro-resonators. The technique does not degrade the internal quality factor of the resonators which remain above 10{sup 5}. Using microwave absorption spectroscopy, we observe electron-spin resonances in good agreement with numerical modelling and extract corresponding coupling rates of the order of 1 MHz and spin linewidths of 50–65 MHz.

  6. Characterization of PEEK, PET and PI implanted with Mn ions and sub-sequently annealed

    NASA Astrophysics Data System (ADS)

    Mackova, A.; Malinsky, P.; Miksova, R.; Pupikova, H.; Khaibullin, R. I.; Slepicka, P.; Gombitová, A.; Kovacik, L.; Svorcik, V.; Matousek, J.

    2014-04-01

    Polyimide (PI), polyetheretherketone (PEEK) and polyethylene terephthalate (PET) foils were implanted with 80 keV Mn+ ions at room temperature at fluencies of 1.0 × 1015-1.0 × 1016 cm-2. Mn depth profiles determined by RBS were compared to SRIM 2012 and TRIDYN simulations. The processes taking place in implanted polymers under the annealing procedure were followed. The measured projected ranges RP differ slightly from the SRIM and TRIDYN simulation and the depth profiles are significantly broader (up to 2.4 times) than those simulated by SRIM, while TRIDYN simulations were in a reasonable agreement up to the fluence 0.5 × 1016 in PEEK. Oxygen and hydrogen escape from the implanted layer was examined using RBS and ERDA techniques. PET, PEEK and PI polymers exhibit oxygen depletion up to about 40% of its content in virgin polymers. The compositional changes induced by implantation to particular ion fluence are similar for all polymers examined. After annealing no significant changes of Mn depth distribution was observed even the further oxygen and hydrogen desorption from modified layers appeared. The surface morphology of implanted polymers was characterized using AFM. The most significant change in the surface roughness was observed on PEEK. Implanted Mn atoms tend to dissipate in the polymer matrix, but the Mn nanoparticles are too small to be observed on TEM micrographs. The electrical, optical and structural properties of the implanted and sub-sequently annealed polymers were investigated by sheet resistance measurement and UV-Vis spectroscopy. With increasing ion fluence, the sheet resistance decreases and UV-Vis absorbance increases simultaneously with the decline of optical band gap Eg. The most pronounced change in the resistance was found on PEEK. XPS spectroscopy shows that Mn appears as a mixture of Mn oxides. Mn metal component is not present. All results were discussed in comparison with implantation experiment using the various ion species (Ni, Co

  7. Charging mechanism during ion implantation without charge compensation

    NASA Astrophysics Data System (ADS)

    Sakai, Shigeki; Fan, Hung-chi; Chen, Emily; Tanjyo, Masayasu

    2006-11-01

    The charge accumulated on an electrode electrically floated during implantation is calculated using a simple model. The model includes the ion beam current, the secondary electron emission, the neutralizing electron current and the leak current through resistance between the electrode and the bulk of wafer. Expressing the leak current with a parameter of relaxation time, it is found that amount of the accumulated charge at the completion of implantation reached at a constant irrespective of the beam current in the condition that the relaxation time is long enough. The experimental result showed that the measured potential of the floated electrode depends on a beam potential as well as the beam current. This result implies that the neutralizing electrons are more effectively transported to the isolated electrode in the high beam current condition compared with in the low beam current condition. We discuss possibility that such charging phenomena may occur in the implantation for BiCMOS or SOI device fabrication.

  8. Charge neutralization apparatus for ion implantation system

    DOEpatents

    Leung, Ka-Ngo; Kunkel, Wulf B.; Williams, Malcom D.; McKenna, Charles M.

    1992-01-01

    Methods and apparatus for neutralization of a workpiece such as a semiconductor wafer in a system wherein a beam of positive ions is applied to the workpiece. The apparatus includes an electron source for generating an electron beam and a magnetic assembly for generating a magnetic field for guiding the electron beam to the workpiece. The electron beam path preferably includes a first section between the electron source and the ion beam and a second section which is coincident with the ion beam. The magnetic assembly generates an axial component of magnetic field along the electron beam path. The magnetic assembly also generates a transverse component of the magnetic field in an elbow region between the first and second sections of the electron beam path. The electron source preferably includes a large area lanthanum hexaboride cathode and an extraction grid positioned in close proximity to the cathode. The apparatus provides a high current, low energy electron beam for neutralizing charge buildup on the workpiece.

  9. Advances in the surface modification techniques of bone-related implants for last 10 years

    PubMed Central

    Qiu, Zhi-Ye; Chen, Cen; Wang, Xiu-Mei; Lee, In-Seop

    2014-01-01

    At the time of implanting bone-related implants into human body, a variety of biological responses to the material surface occur with respect to surface chemistry and physical state. The commonly used biomaterials (e.g. titanium and its alloy, Co–Cr alloy, stainless steel, polyetheretherketone, ultra-high molecular weight polyethylene and various calcium phosphates) have many drawbacks such as lack of biocompatibility and improper mechanical properties. As surface modification is very promising technology to overcome such problems, a variety of surface modification techniques have been being investigated. This review paper covers recent advances in surface modification techniques of bone-related materials including physicochemical coating, radiation grafting, plasma surface engineering, ion beam processing and surface patterning techniques. The contents are organized with different types of techniques to applicable materials, and typical examples are also described. PMID:26816626

  10. Upgraded vacuum arc ion source for metal ion implantation

    SciTech Connect

    Nikolaev, A. G.; Oks, E. M.; Savkin, K. P.; Yushkov, G. Yu.; Brown, I. G.

    2012-02-15

    Vacuum arc ion sources have been made and used by a large number of research groups around the world over the past twenty years. The first generation of vacuum arc ion sources (dubbed ''Mevva,'' for metal vapor vacuum arc) was developed at Lawrence Berkeley National Laboratory in the 1980s. This paper considers the design, performance parameters, and some applications of a new modified version of this kind of source which we have called Mevva-V.Ru. The source produces broad beams of metal ions at an extraction voltage of up to 60 kV and a time-averaged ion beam current in the milliampere range. Here, we describe the Mevva-V.Ru vacuum arc ion source that we have developed at Tomsk and summarize its beam characteristics along with some of the applications to which we have put it. We also describe the source performance using compound cathodes.

  11. Diffusion mechanism and the thermal stability of fluorine ions in GaN after ion implantation

    SciTech Connect

    Wang, M. J.; Yuan, L.; Chen, K. J.; Xu, F. J.; Shen, B.

    2009-04-15

    The diffusion mechanisms of fluorine ions in GaN are investigated by means of time-of-flight secondary ion mass spectrometry. Instead of incorporating fluorine ions close to the sample surface by fluorine plasma treatment, fluorine ion implantation with an energy of 180 keV is utilized to implant fluorine ions deep into the GaN bulk, preventing the surface effects from affecting the data analysis. It is found that the diffusion of fluorine ions in GaN is a dynamic process featuring an initial out-diffusion followed by in- diffusion and the final stabilization. A vacancy-assisted diffusion model is proposed to account for the experimental observations, which is also consistent with results on molecular dynamic simulation. Fluorine ions tend to occupy Ga vacancies induced by ion implantation and diffuse to vacancy rich regions. The number of continuous vacancy chains can be significantly reduced by a dynamic thermal annealing process. As a result, strong local confinement and stabilization of fluorine ions can be obtained in GaN crystal, suggesting excellent thermal stability of fluorine ions for device applications.

  12. Fabrication and characterization of a co-planar detector in diamond for low energy single ion implantation

    NASA Astrophysics Data System (ADS)

    Abraham, J. B. S.; Aguirre, B. A.; Pacheco, J. L.; Vizkelethy, G.; Bielejec, E.

    2016-08-01

    We demonstrate low energy single ion detection using a co-planar detector fabricated on a diamond substrate and characterized by ion beam induced charge collection. Histograms are taken with low fluence ion pulses illustrating quantized ion detection down to a single ion with a signal-to-noise ratio of approximately 10. We anticipate that this detection technique can serve as a basis to optimize the yield of single color centers in diamond. The ability to count ions into a diamond substrate is expected to reduce the uncertainty in the yield of color center formation by removing Poisson statistics from the implantation process.

  13. Mechanical properties of ion-implanted tungsten-5 wt% tantalum

    NASA Astrophysics Data System (ADS)

    Armstrong, D. E. J.; Wilkinson, A. J.; Roberts, S. G.

    2011-12-01

    Ion implantation has been used to simulate neutron damage in W-5wt%Ta alloy manufactured by arc melting. Implantations were carried out at damage levels of 0.07, 1.2, 13 and 33 displacements per atom (dpa). The mechanical properties of the ion-implanted layer were investigated by nanoindentation. The hardness increases rapidly from 7.3 GPa in the unimplanted condition to 8.8 GPa at 0.07 dpa. Above this damage level, the increase in hardness is lower, and the hardness change saturates by 13 dpa. In the initial portion of the load-displacement curves, the indentations in unimplanted material show a large 'initial pop-in' corresponding to the onset of plasticity. This is not seen in the implanted samples at any doses. The change in plasticity has also been studied using the nanoindenter in scanning mode to produce a topographical scan around indentations. In the unimplanted condition there is an extensive pile-up around the indentation. At damage levels of 0.07 and 1.2 dpa the extent and height of pile-up are much less. The reasons for this are under further investigation.

  14. Surgical implantation techniques for electronic tags in fish

    SciTech Connect

    Wagner, Glenn N.; Cooke, Steven J.; Brown, Richard S.; Deters, Katherine A.

    2011-01-01

    Intracoelomic implantation of transmitters into fish requires making a surgical incision, incision closure, and other surgery related techniques; however, the tools and techniques used in the surgical process vary widely. We review the available literature and focus on tools and techniques used for conducting surgery on juvenile salmonids because of the large amount of research that is conducted on them. The use of sterilized surgical instruments properly selected for a given size of fish will minimize tissue damage and infection rates, and speed the wound healing of fish implanted with transmitters. For the implantation of transmitters into small fish, the optimal surgical methods include making an incision on the ventral midline along the linea alba (for studies under 1 month), protecting the viscera (by lifting the skin with forceps while creating the incision), and using absorbable monofilament suture with a small-swaged-on swaged-on tapered or reverse-cutting needle. Standardizing the implantation techniques to be used in a study involving particular species and age classes of fish will improve survival and transmitter retention while allowing for comparisons to be made among studies and across multiple years. This review should be useful for researchers working on juvenile salmonids and other sizes and species of fish.

  15. Temperature behavior of damage in sapphire implanted with light ions

    NASA Astrophysics Data System (ADS)

    Alves, E.; Marques, C.; Sáfrán, G.; McHargue, Carl J.

    2009-05-01

    In this study, we compare and discuss the defect behavior of sapphire single crystals implanted with different fluences (1 × 1016-1 × 1017 cm-2) of carbon and nitrogen with 150 keV. The implantation temperatures were RT, 500 °C and 1000 °C to study the influence of temperature on the defect structures. For all the ions the Rutherford backscattering-channeling (RBS-C) results indicate a surface region with low residual disorder in the Al-sublattice. Near the end of range the channeled spectrum almost reaches the random indicating a high damage level for fluences of 1 × 1017 cm-2. The transmission electron microscopy (TEM) photographs show a layered contrast feature for the C implanted sample where a buried amorphous region is present. For the N implanted sample the Electron Energy Loss Spectroscopy (EELS) elemental mapping give evidence for the presence of a buried damage layer decorated with bubbles. Samples implanted at high temperatures (500 °C and 1000 °C) show a strong contrast fluctuation indicating a defective crystalline structure of sapphire.

  16. Reactive-element effect studied using ion implantation

    SciTech Connect

    King, W.E.; Grabowski, K.S.

    1988-11-01

    Implantation of reactive elements into metals that form chromia layers upon exposure to high temperature oxidizing environments has a very large effect on the growth rate of the oxide and adhesion of the oxide to the base alloy. We have investigated the effect of Y ion implantation on the high temperature oxidation of Fe-24Cr using Rutherford backscattering spectroscopy, secondary ion mass spectroscopy, and electron microscopy. Analytical tools have been applied to determine the spatial distribution of Y, the microstructure of the oxide, and contribution of oxygen transport to the oxidation process. Results are compared with similar experiments in Fe-Cr alloys with Y additions and with results of cation and anion tracer diffusion experiments. 51 refs., 17 figs., 3 tabs.

  17. The enhanced anticoagulation for graphene induced by COOH+ ion implantation

    NASA Astrophysics Data System (ADS)

    Liu, Xiaoqi; Cao, Ye; Zhao, Mengli; Deng, Jianhua; Li, Xifei; Li, Dejun

    2015-01-01

    Graphene may have attractive properties for some biomedical applications, but its potential adverse biological effects, in particular, possible modulation when it comes in contact with blood, require further investigation. Little is known about the influence of exposure to COOH+-implanted graphene (COOH+/graphene) interacting with red blood cells and platelets. In this paper, COOH+/graphene was prepared by modified Hummers' method and implanted by COOH+ ions. The structure and surface chemical and physical properties of COOH+/graphene were characterized by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and contact angle measurement. Systematic evaluation of anticoagulation, including in vitro platelet adhesion assays and hemolytic assays, proved that COOH+/graphene has significant anticoagulation. In addition, at the dose of 5 × 1017 ions/cm2, COOH+/graphene responded best on platelet adhesion, aggregation, and platelet activation.

  18. Indium Phosphide Nanocrystals Formed in Silica by Sequential Ion Implantation

    SciTech Connect

    Denmark, D.; Ueda, A.; Shao, C. L.; Wu, M. H.; Mu, R.; White, Clark W; Vlahovic, B.; Muntele, C. I.; Ila, Dr. Daryush; Liu, Y. C.

    2005-01-01

    Fused silica substrates were implanted with: (1) phosphorus only, (2) indium only, and (3) phosphorus plus indium ions. Vibrational and electronic characterizations have been performed on the P only and In only samples to obtain an understanding of the thermal annealing behavior in order to obtain a meaningful guide for the fabrication of InP quantum dots (QDs) formed by sequential ion implantation of In and P in SiO{sub 2}. Thermal annealing procedures for InP synthesis have been established and InP quantum dots are confirmed by TEM, XRD and far infrared measurements. Far IR spectra show a single resonance at 323 cm{sup -1} rather than two absorption peaks in its counterpart of bulk InP crystals. The single band absorption is attributed to the surface phonon of InP quantum dots which will appear between transverse optical (TO) and longitudinal optical (LO) phonon modes of the bulk.

  19. Thermal stability of ion-implanted ZnO

    SciTech Connect

    Coleman, V; Tan, H; Jagadish, C; Kucheyev, S; Zou, J

    2005-06-16

    Zinc oxide single crystals implanted at room temperature with high-dose (1.4 x 10{sup 17} cm{sup -2}) 300 keV As{sup +} ions are annealed at 1000-1200 C. Damage recovery is studied by a combination of Rutherford backscattering/ channeling spectrometry (RBS/C), cross-sectional transmission electron microscopy (XTEM), and atomic force microscopy (AFM). Results show that such a thermal treatment leads to the decomposition and evaporation of the heavily-damaged layer instead of apparent defect recovery and recrystallization that could be inferred from RBS/C and XTEM data alone. Such a relatively poor thermal stability of heavily-damaged ZnO has significant implications for understanding results on thermal annealing of ion-implanted ZnO.

  20. Immobilization of calcium and phosphate ions improves the osteoconductivity of titanium implants.

    PubMed

    Sunarso; Toita, Riki; Tsuru, Kanji; Ishikawa, Kunio

    2016-11-01

    In this work, to elevate weak osteoconductivity of titanium (Ti) implant, we prepared a Ti implant having both calcium and phosphate ions on its surface. To modify calcium and phosphate ions onto Ti, phosphate ions were first immobilized by treating the Ti with a NaH2PO4 solution, followed by CaCl2 treatment to immobilize calcium ions, which created the calcium and phosphate ions-modified Ti (Ca-P-Ti). X-ray photoelectron spectroscopy and thin-layer X-ray diffraction measurement confirmed that both phosphate and calcium ions were co-immobilized onto the Ti surface on the molecular level. Three-hour after seeding MC3T3-E1 murine pre-osteoblast cells on substrates, cell number on Ca-P-Ti was much larger than that of Ti and phosphate-modified Ti (P-Ti), but was similar to that of calcium-modified Ti (Ca-Ti). Also, MC3T3-E1 cells on Ca-P-Ti expressed larger amount of vinculin, a focal adhesion protein, than those on other substrates, probably resulting in larger cell size as well as greater cell proliferation on Ca-P-Ti than those on other substrates. Alkaline phosphatase activity of cells on Ca-P-Ti was greater than those on Ti and P-Ti, but was almost comparable to that of Ca-Ti. Moreover, the largest amount of bone-like nodule formation was observed on Ca-P-Ti. These results provide evidence that calcium and phosphate ions-co-immobilization onto Ti increased the osteoconductivity of Ti by stimulating the responses of pre-osteoblast cells. This simple modification would be promising technique for bone tissue implant including dental and orthopedic implants. PMID:27524023

  1. Irradiation hardening of ODS ferritic steels under helium implantation and heavy-ion irradiation

    NASA Astrophysics Data System (ADS)

    Zhang, Hengqing; Zhang, Chonghong; Yang, Yitao; Meng, Yancheng; Jang, Jinsung; Kimura, Akihiko

    2014-12-01

    Irradiation hardening of ODS ferritic steels after multi-energy He-ion implantation, or after irradiation with energetic heavy ions including Xe and Bi-ions was investigated with nano-indentation technique. Three kinds of high-Cr ODS ferritic steels including the commercial MA956 (19Cr-3.5Al), the 16Cr-0.1Ti and the 16Cr-3.5Al-0.1Zr were used. Data of nano-hardness were analyzed with an approach based on Nix-Gao model. The depth profiles of nano-hardness can be understood by the indentation size effect (ISE) in specimens of MA956 implanted with multi-energy He-ions or irradiated with 328 MeV Xe ions, which produced a plateau damage profile in the near-surface region. However, the damage gradient overlaps the ISE in the specimens irradiated with 9.45 Bi ions. The dose dependence of the nano-hardness shows a rapid increase at low doses and a slowdown at higher doses. An 1/2-power law dependence on dpa level is obtained. The discrepancy in nano-hardness between the helium implantation and Xe-ion irradiation can be understood by using the average damage level instead of the peak dpa level. Helium-implantation to a high dose (7400 appm/0.5 dpa) causes an additional hardening, which is possibly attributed to the impediment of motion dislocations by helium bubbles formed in high concentration in specimens.

  2. Tribological properties changes of H13 steel induced by MEVVA Ta ion implantation*1

    NASA Astrophysics Data System (ADS)

    Jianhua, Yang; Tonghe, Zhang

    2004-05-01

    The tribological properties of Ta-implanted H13 steel was studied using a metal vapor vacuum arc (MEVVA) ion source. The doses of Ta and C ions implanted on H13 steel were 5×10 17 and 2×10 17 cm -2, respectively. The extraction voltages were 48 kV for Ta implantation and 30 kV for C implantation. Rutherford backscattering spectrum (RBS) was used to measure the surface composition of the samples implanted. The observation of phase induced by Ta, C implantation was carried out by grazing-angle X-ray diffraction (GXRD). The wear test of the implanted surface revealed that Ta+C dual implantation reduced the wear of the implanted steel by nearly a factor of 2. This wear mechanism of the Ta-implanted steel was compared with that of Ti implantation.

  3. Oxygen incorporation in polyethylene implanted with 150 keV Sb+ ions

    NASA Astrophysics Data System (ADS)

    Hnatowicz, V.; Kvítek, J.; Švorčík, V.; Rybka, V.; Popok, V.

    1994-06-01

    Samples of polyethylene (PE) loaded with carbon black up to 8 wt.% and implanted with 150 keV Sb+ ions to the doses from 2×1013-2×1015 cm-2 were studied using standard Rutherford Back Scattering (RBS) technique. On the PE samples implanted to the doses above 2×1014 cm-2, a considerable surface carbonization is observed. The measured parameters of the Sb depth profile are compared with theoretical TRIM estimations. The projected range is by 25% lower than the theoretical one and the range straggling is about twice of that predicted. The differences are explained by stepwise polymer degradation during the ion bombardment. Strong oxidation of the ion implanted polymers is also observed. The oxygen depth profiles from the sample surface up to the depth comparable with Sb+ ion range evolve from nearly uniform one for low ion doses to highly non-uniform one for doses above 1×1015 cm-2. The total oxygen content in the sample surface layer 300 nm thick reaches a maximum for the doses of (1-2)×1014 cm-2.

  4. Urinary catheter with polyurethane coating modified by ion implantation

    NASA Astrophysics Data System (ADS)

    Kondyurina, I.; Nechitailo, G. S.; Svistkov, A. L.; Kondyurin, A.; Bilek, M.

    2015-01-01

    A low friction urinary catheter that could be used without a lubricant is proposed in this work. A polyurethane coating was synthesised on the surface of a metal guide wire catheter. Ion implantation was applied to surface modify the polyurethane coating. FTIR ATR, wetting angle, AFM and friction tests were used for analysis. Low friction was found to be provided by the formation of a hard carbonised layer on the polyurethane surface.

  5. Energy loss of ions implanted in MOS dielectric films

    NASA Astrophysics Data System (ADS)

    Shyam, Radhey

    Energy loss measurements of ions in the low kinetic energy regime have been made on as-grown SiO2(170-190nm) targets. Singly charged Na + ions with kinetic energies of 2-5 keV and highly charged ions Ar +Q (Q=4, 8 and 11) with a kinetic energy of 1 keV were used. Excitations produced by the ion energy loss in the oxides were captured by encapsulating the irradiated oxide under a top metallic contact. The resulting Metal-Oxide-Semiconductor (MOS) devices were probed with Capacitance-Voltage (C V) measurements and extracted the flatband voltages from the C-V curves. The C-V results for singly charged ion experiments reveal that the changes in the flatband voltage and slope for implanted devices relative to the pristine devices can be used to delineate effects due to implanted ions only and ion induced damage. The data shows that the flatband voltage shifts and C-V slope changes are energy dependent. The observed changes in flatband voltage which are greater than those predicted by calculations scaled for the ion dose and implantation range (SRIM). These results, however, are consistent with a columnar recombination model, where electron-hole pairs are created due to the energy deposited by the implanted ions within the oxide. The remaining holes left after recombination losses are diffused through the oxide at the room temperature and remain present as trapped charges. Comparison of the data with the total number of the holes generated gives a fractional yield of 0.0124 which is of the same order as prior published high energy irradiation experiments. Additionally, the interface trap density, extracted from high and low frequency C-V measurements is observed to increase by one order of magnitude over our incident beam energy. These results confirm that dose- and kinetic energy -dependent effects can be recorded for singly charged ion irradiation on oxides using this method. Highly charged ion results also confirm that dose as well as and charge-dependent effects can

  6. Experimental investigations of helium ion implantation in the first wall of JET

    NASA Astrophysics Data System (ADS)

    Zhu, J.; McCracken, G. M.; Coad, J. P.

    1991-07-01

    3.5 MeV alpha particles will be produced in fusion reactors. Although they will be slowed down in the plasma, they will still retain some energy upon diffusing out to the wall and therefore will be expected to become implanted there. We have developed a technique for measuring the depth distribution of helium implanted in metals. The technique has been applied to the analysis of Ni and inconel samples exposed in the JET tokamak for ˜ 5000 discharges during 1987-1988 with ion cyclotron resonance heating (ICRH). Significant quantities of 3He and 4He atoms have been detected due to the use of helium both as a plasma fuel and as a minority species for ICRH. The energy distribution of the ions heated by ICRH in the plasma is expected to be similar to that characterizing the alpha particles in a reactor. The analysis shows a broad range distribution in the samples up to at least 1.0 μm in depth. Calibration of the technique has been performed using implants of monoenergetic 3He and 4He at energies of 2-50 keV and fluences of (1-5) × 10 16 ions cm -2. The results are in quite good agreement with predictions from the TRIM code. The sensitivity of the system is such that concentrations of 5 ×10 18 atoms cm˜3 ( ˜ 50 ppm) are detectable.

  7. Ca and O ion implantation doping of GaN

    SciTech Connect

    Zolper, J.C.; Wilson, R.G.; Pearton, S.J.; Stall, R.A.

    1996-04-01

    {ital p}- and {ital n}-type doping of GaN have been realized by ion implantation of Ca and O, respectively. Rapid thermal annealing at 1100{degree}C or higher is required to achieve {ital p}-type conduction in Ca or Ca+P implanted samples with an estimated ionization level of 169 meV and a corresponding activation efficiency of {approximately}100{percent}. This is the first experimental report of an acceptor species in GaN, other than Mg, with an ionization energy level less than 180 meV. O-implanted GaN displays an ionization level of {approximately}29 meV but with an activation efficiency of only 3.6{percent} after a 1050{degree}C anneal that may result from insufficient vacancy generation for the lighter O ion or from the existence of a second, deeper O energy level. Neither Ca or O displayed measurable redistribution, based on secondary ion mass spectrometry measurements, even after a 1125{degree}C anneal. {copyright} {ital 1996 American Institute of Physics.}

  8. Observations of Ag diffusion in ion implanted SiC

    DOE PAGESBeta

    Gerczak, Tyler J.; Leng, Bin; Sridharan, Kumar; Jerry L. Hunter, Jr.; Giordani, Andrew J.; Allen, Todd R.

    2015-03-17

    The nature and magnitude of Ag diffusion in SiC has been a topic of interest in connection with the performance of tristructural isotropic (TRISO) coated particle fuel for high temperature gas-cooled nuclear reactors. Ion implantation diffusion couples have been revisited to continue developing a more complete understanding of Ag fission product diffusion in SiC. Ion implantation diffusion couples fabricated from single crystal 4H-SiC and polycrystalline 3C-SiC substrates and exposed to 1500–1625°C, were investigated in this study by transmission electron microscopy and secondary ion mass spectrometry (SIMS). The high dynamic range of SIMS allowed for multiple diffusion régimes to be investigated,more » including enhanced diffusion by implantation-induced defects and grain boundary (GB) diffusion in undamaged SiC. Lastly, estimated diffusion coefficients suggest GB diffusion in bulk SiC does not properly describe the release observed from TRISO fuel.« less

  9. Ablation Plasma Ion Implantation Optimization and Deposition of Compound Coatings

    NASA Astrophysics Data System (ADS)

    Jones, M. C.; Qi, B.; Gilgenbach, R. M.; Johnston, M. D.; Lau, Y. Y.; Doll, G. L.; Lazarides, A.

    2002-10-01

    Ablation Plasma Ion Implantation (APII) utilizes KrF laser ablation plasma plumes to implant ions into pulsed, negatively-biased substrates [1]. Ablation targets are Ti foils and TiN disks. Substrates are Si wafers and Al, biased from 0 to -10 kV. Optimization experiments address: 1) configurations that reduce arcing, 2) reduction of particulate, and 3) deposition/implantation of compounds (e.g. TiN). Arcing is suppressed by positioning the target perpendicular (previously parallel) to the substrate. Thus, bias voltage can be applied at the same time as the KrF laser, resulting in higher ion current. This geometry also yields lower particulate. APII with TiN has the goal of hardened coatings with excellent adhesion. SEM, AFM, XPS, TEM, and scratch tests characterize properties of the thin films. Ti APII films at - 4kV are smoother with lower friction. 1. B. Qi, R.M. Gilgenbach, Y.Y. Lau, M.D. Johnston, J. Lian, L.M. Wang, G. L. Doll and A. Lazarides, APL, 78, 3785 (2001) * Research funded by NSF

  10. Bubble formation in Zr alloys under heavy ion implantation

    SciTech Connect

    Pagano, L. Jr.; Motta, A.T.; Birtcher, R.C.

    1995-12-01

    Kr ions were used in the HVEM/Tandem facility at ANL to irradiate several Zr alloys, including Zircaloy-2 and -4, at 300-800 C to doses up to 2{times}10{sup 16}ion.cm{sup -2}. Both in-situ irradiation of thin foils as well as irradiation of bulk samples with an ion implanter were used in this study. For the thin foil irradiations, a distribution of small bubbles in the range of 30-100 {angstrom} was found at all temperatures with the exception of the Cr-rich Valloy where 130 {angstrom} bubbles were found. Irradiation of bulk samples at 700-800 C produced large faceted bubbles up to 300 {angstrom} after irradiation to 2{times}10{sup 16}ion.cm{sup -2}. Results are examined in context of existing models for bubble formation and growth in other metals.

  11. Simultaneous Sterilization With Surface Modification Of Plastic Bottle By Plasma-Based Ion Implantation

    SciTech Connect

    Sakudo, N.; Ikenaga, N.; Ikeda, F.; Nakayama, Y.; Kishi, Y.; Yajima, Z.

    2011-01-07

    Dry sterilization of polymeric material is developed. The technique utilizes the plasma-based ion implantation which is same as for surface modification of polymers. Experimental data for sterilization are obtained by using spores of Bacillus subtilis as samples. On the other hand we previously showed that the surface modification enhanced the gas barrier characteristics of plastic bottles. Comparing the implantation conditions for the sterilization experiment with those for the surface modification, we find that both sterilization and surface modification are simultaneously performed in a certain range of implantation conditions. This implies that the present bottling system for plastic vessels will be simplified and streamlined by excluding the toxic peroxide water that has been used in the traditional sterilization processes.

  12. Simultaneous Sterilization With Surface Modification Of Plastic Bottle By Plasma-Based Ion Implantation

    NASA Astrophysics Data System (ADS)

    Sakudo, N.; Ikenaga, N.; Ikeda, F.; Nakayama, Y.; Kishi, Y.; Yajima, Z.

    2011-01-01

    Dry sterilization of polymeric material is developed. The technique utilizes the plasma-based ion implantation which is same as for surface modification of polymers. Experimental data for sterilization are obtained by using spores of Bacillus subtilis as samples. On the other hand we previously showed that the surface modification enhanced the gas barrier characteristics of plastic bottles. Comparing the implantation conditions for the sterilization experiment with those for the surface modification, we find that both sterilization and surface modification are simultaneously performed in a certain range of implantation conditions. This implies that the present bottling system for plastic vessels will be simplified and streamlined by excluding the toxic peroxide water that has been used in the traditional sterilization processes.

  13. Damage formation and annealing at low temperatures in ion implanted ZnO

    SciTech Connect

    Lorenz, K.; Alves, E.; Wendler, E.; Bilani, O.; Wesch, W.; Hayes, M.

    2005-11-07

    N, Ar, and Er ions were implanted into ZnO at 15 K within a large fluence range. The Rutherford backscattering technique in the channeling mode was used to study in situ the damage built-up in the Zn sublattice at 15 K. Several stages in the damage formation were observed. From the linear increase of the damage for low implantation fluences, an upper limit of the Zn displacement energy of 65 eV could be estimated for [0001] oriented ZnO. Annealing measurements below room temperature show a significant recovery of the lattice starting at temperatures between 80 and 130 K for a sample implanted with low Er fluence. Samples with higher damage levels do not reveal any damage recovery up to room temperature, pointing to the formation of stable defect complexes.

  14. Mechanical properties of ion-beam-textured surgical implant alloys

    NASA Technical Reports Server (NTRS)

    Weigand, A. J.

    1977-01-01

    An electron-bombardment Hg ion thruster was used as an ion source to texture surfaces of materials used to make orthopedic and/or dental prostheses or implants. The materials textured include 316 stainless steel, titanium-6% aluminum, 4% vanadium, and cobalt-20% chromium, 15% tungsten. To determine the effect of ion texturing on the ultimate strength and yield strength, stainless steel and Co-Cr-W alloy samples were tensile tested to failure. Three types of samples of both materials were tested. One type was ion-textured (the process also heats each sample to 300 C), another type was simply heated to 300 C in an oven, and the third type was untreated. Stress-strain diagrams, 0.2% offset yield strength data, total elongation data, and area reduction data are presented. Fatigue specimens of ion textured and untextured 316 stainless steel and Ti-6% Al-4% V were tested. Included as an ion textured sample is a Ti-6% Al-4% V sample which was ion machined by means of Ni screen mask so as to produce an array of 140 mu m x 140 mu m x 60 mu m deep pits. Scanning electron microscopy was used to characterize the ion textured surfaces.

  15. Implant alignment in total elbow arthroplasty: conventional vs. navigated techniques

    NASA Astrophysics Data System (ADS)

    McDonald, Colin P.; Johnson, James A.; King, Graham J. W.; Peters, Terry M.

    2009-02-01

    Incorrect selection of the native flexion-extension axis during implant alignment in elbow replacement surgery is likely a significant contributor to failure of the prosthesis. Computer and image-assisted surgery is emerging as a useful surgical tool in terms of improving the accuracy of orthopaedic procedures. This study evaluated the accuracy of implant alignment using an image-based navigation technique compared against a conventional non-navigated approach. Implant alignment error was 0.8 +/- 0.3 mm in translation and 1.1 +/- 0.4° in rotation for the navigated alignment, compared with 3.1 +/- 1.3 mm and 5.0 +/- 3.8° for the non-navigated alignment. Five (5) of the 11 non-navigated alignments were malaligned greater than 5° while none of the navigated alignments were placed with an error of greater than 2.0°. It is likely that improved implant positioning will lead to reduced implant loading and wear, resulting in fewer implantrelated complications and revision surgeries.

  16. Ion beam analysis of aluminium ion implanted titanium diboride thin films

    NASA Astrophysics Data System (ADS)

    Mollica, S.; Sood, D. K.; Evans, P. J.; Dytlewski, N.; Short, K. T.

    2002-05-01

    Titanium diboride is often selected for protective coatings due to its high hardness and wear resistance. However, its possible high temperature applications are limited because it exhibits poor oxidation resistance at elevated temperatures. Through ion beam modification, it was anticipated that a stable oxidation barrier could form via the formation of "metastable phases" not otherwise observed in stoichiometric TiB 2. Titanium diboride films were deposited onto single-crystal Si(1 0 0) substrates using DC magnetron sputtering. MEVVA ion implantation was then performed using an extraction voltage of 40 kV. Selected samples were subjected to post-implantation vacuum annealing prior to oxidation, thus comparing the behaviour of crystalline and amorphous films. Results show that aluminium ion implantation reduces the oxidation rate of DC magnetron sputtered titanium diboride thin films within the experimental temperature range.

  17. Axillary vein technique for pacemaker and implantable defibrillator leads implantation: a safe and alternative approach?

    PubMed

    Migliore, Federico; Curnis, Antonio; Bertaglia, Emanuele

    2016-04-01

    Different methods for venous access are used for permanent pacemaker or implantable cardioverter defibrillator (ICD), of which subclavian vein puncture technique is the most widely practised. Although this approach is relatively easy to learn, quick and offers high success rates, it may be associated with potential serious acute complications including pneumothorax, emopneumothorax, brachial plexus injury and longer-term complications such as lead fracture, loss of lead insulation and subclavian crush syndrome especially in young patients with ICD leads. Axillary vein approach seems to be a favourable technique not only for the prevention of acute complications but also to reduce lead failure including lead insulation and lead fracture prevention with a consequently better long-term lead survival compared with the classical subclavian approach. Although randomized studies are lacking, recent reports not only evaluated the safety and effectiveness of new fluoroscopic axillary venous puncture technique, but also compared it with the conventional intrathoracic subclavian venous puncture technique for the implantation of leads in permanent pacing. Various techniques of axillary vein puncture have been proposed ranging from a blind percutaneous puncture to the use of different tools such as contrast venography and ultrasound. In this article, we report a case of subclavian crush syndrome, the use of a modified Bellot's technique of axillary vein puncture that we currently use and the potential benefits of axillary vein puncture for pacemaker and ICD leads implantation compared with subclavian approach to avoid acute and long-term lead complications. PMID:25252042

  18. A comparative study of the structure and cytotoxicity of polytetrafluoroethylene after ion etching and ion implantation

    NASA Astrophysics Data System (ADS)

    Shtansky, D. V.; Glushankova, N. A.; Kiryukhantsev-Korneev, F. V.; Sheveiko, A. N.; Sigarev, A. A.

    2011-03-01

    The ion-plasma treatment has been widely used for modifying the surface structure of polymers in order to improve their properties, but it can lead to destruction of the surface and, as a consequence, to an increase in their toxicity. A comparative study of the structure and cytotoxicity of polytetrafluoroethylene (PTFE) after the ion etching (IE) and ion implantation (II) for 10 min with energy densities of 363 and 226 J/cm2, respectively, has been performed. It has been shown that, unlike the ion implantation, the ion etching results in the destruction of the polymer and in the appearance of the cytotoxicity. The factors responsible for this effect, which are associated with the bulk and surface treatment, as well as with the influence of the temperature, have been discussed.

  19. Experimental results of a dual-beam ion source for 200 keV ion implanter

    SciTech Connect

    Chen, L. H. Cui, B. Q.; Ma, R. G.; Ma, Y. J.; Tang, B.; Huang, Q. H.; Jiang, W. S.; Zheng, Y. N.

    2014-02-15

    A dual beam ion source for 200 keV ion implanter aimed to produce 200 keV H{sub 2}{sup +} and He{sup +} beams simultaneously has been developed. Not suitable to use the analyzing magnet, the purity of beam extracted from the source becomes important to the performance of implanter. The performance of ion source was measured. The results of experiments show that the materials of inlet tube of ion source, the time of arc ionization in ion source, and the amount of gas flow have significant influence on the purity of beam. The measures by using copper as inlet tube material, long time of arc ionization, and increasing the inlet of gas flow could effectively reduce the impurity of beam. And the method using the gas mass flow controller to adjust the proportion of H{sub 2}{sup +} and He{sup +} is feasible.

  20. Applications of ion implantation to high performance, radiation tolerant silicon solar cells

    NASA Technical Reports Server (NTRS)

    Kirkpatrick, A. R.; Minnucci, J. A.; Matthei, K. W.

    1979-01-01

    Progress in the development of ion implanted silicon solar cells is reported. Effective back surface preparation by implantation, junction processing to achieve high open circuit voltages in low-resistivity cells, and radiation tolerance cells are among the topics studied.

  1. Evaluation of the ion implantation process for production of solar cells from silicon sheet materials

    NASA Technical Reports Server (NTRS)

    Spitzer, M. B.

    1983-01-01

    For the ion implantation tooling was fabricated with which to hold dendritic web samples. This tooling permits the expeditious boron implantation of the back to form the back surface field (BSF). Baseline BSF web cells were fabricated.

  2. Hydrophilic property by contact angle change of ion implanted polycarbonate

    SciTech Connect

    Lee, Chan Young; Kil, Jae Keun

    2008-02-15

    In this study, ion implantation was performed onto a polymer, polycarbonate (PC), in order to investigate surface hydrophilic property through contact angle measurement. PC was irradiated with N, Ar, and Xe ions at the irradiation energy of 20-50 keV and the dose range of 5x10{sup 15}, 1x10{sup 16}, 7x10{sup 16} ions/cm{sup 2}. The contact angle of water was estimated by means of the sessile drop method and was reduced with increasing fluence and ion mass but increased with increasing implanted energy. The changes of chemical and structural properties are discussed in view of Furier transform infrared and x-ray photoelectron spectroscopy, which shows increasing C-O bonding and C-C bonding. The surface roughness examined by atomic force microscopy measurement changed smoothly from 3.59 to 2.22 A as the fluence increased. It is concluded that the change in wettability may be caused by surface carbonization and oxidation as well as surface roughness.

  3. Defect studies of zirconia implanted by high energy Xe ions

    NASA Astrophysics Data System (ADS)

    Melikhova, O.; Čížek, J.; Procházka, I.; Hruška, P.; Skuratov, V. A.; Konstantinova, T. E.; Danilenko, I. A.

    2016-01-01

    In the present work positron lifetime spectroscopy was employed for characterization of radiation-induced defects in yttria stabilized zirconia (YSZ) implanted by 167 MeV Xe ions. Positron lifetime data were interpreted with aid of ab-initio theoretical modelling of defects in YSZ lattice. Damage caused by Xe implantation was investigated in two YSZ samples with different microstructure: (i) single crystal and (ii) sintered ceramic. The virgin YSZ single crystal exhibits single component spectrum with lifetime of ≈ 180 ps. Similar lifetime component was found also in the virgin sample of sintered YSZ ceramic. Since this lifetime is significantly higher than the YSZ bulk lifetime the virgin YSZ crystal and the sintered ceramic both contain vacancy-like defects. Xe implantation leads to appearance of additional defect component with longer lifetime ≈ 370 ps which comes obviously from vacancy clusters fonned by agglomeration of irradiation induced vacancies. A broad absorption band with peak absorption at ≈ 518 nm was found in Xe-implanted crystal by optical measurements.

  4. The effects of ion implantation on the beaks of orthodontic pliers

    SciTech Connect

    Mizrahi, E.; Cleaton-Jones, P.E.; Luyckz, S.; Fatti, L.P. )

    1991-06-01

    The surface of stainless steel may be hardened by bombarding the material with a stream of nitrogen ions generated by a nuclear accelerator. In the present study this technique was used to determine the hardening effect of ion implantation on the beaks of stainless steel orthodontic pliers. Ten orthodontic pliers (Dentarum 003 094) were divided into two equal groups, designated control and experimental. The beaks of the experimental pliers were subjected to ion implantation, after which the tips of the beaks of all the pliers were stressed in an apparatus attached to an Instron testing machine. A cyclical load of 500 N was applied to the handles of the pliers, while a 0.9 mm (0.036 inch) round, stainless steel wire was held between the tips of the beaks. The effect of the stress was assessed by measurement with a traveling microscope of the gap produced between the tips of the beaks. Measurements were taken before loading and after 20, 40, 60, and 80 cycles. Statistical analysis of variance and the two-sample t tests indicated that there was a significant increase in the size of the gap as the pliers were stressed from 0 to 80 cycles (p less than 0.001). Furthermore, the mean gap was significantly greater in the control group than in the experimental group (p less than 0.001). This study suggests that ion implantation increases the hardness of the tips of the beaks of orthodontic pliers.

  5. Ion-implanted epitaxially grown ZnSe

    NASA Technical Reports Server (NTRS)

    Chernow, F.

    1975-01-01

    The use of ZnSe to obtain efficient, short wavelength injection luminescence was investigated. It was proposed that shorter wavelength emission and higher efficiency be achieved by employing a p-i-n diode structure rather than the normal p-n diode structure. The intervening i layer minimizes concentration quenching effects and the donor-acceptor pair states leading to long wavelength emission. The surface p layer was formed by ion implantation; implantation of the i layer rather than the n substrate permits higher, uncompensated p-type doping. An ion implanted p-n junction in ZnSe is efficiency-limited by high electron injection terminating in nonradiative recombination at the front surface, and by low hole injection resulting from the inability to obtain high conductivity p-type surface layers. While the injection ratio in p-n junctions was determined by the radio of majority carrier concentrations, the injection ratio in p-i-n structures was determined by the mobility ratios and/or space charge neutrality requirements in the i layer.

  6. High- Tc superconductor characteristics control by ion implantation

    NASA Astrophysics Data System (ADS)

    Matsui, S.; Matsutera, H.; Yoshitake, T.; Fujita, J.; Satoh, T.

    1989-03-01

    Transition temperature ( Tc) control and annealing effects of YBa 2Cu 3O x and Bi 2Sr 1.4 Ca 1.8Cu 2.2O y superconductor thin films implanted by 200 keV Ne + have been investigated. YBa 2Cu 3 O xTc end points for 0, 1 × 10 14, 1 × 10 15 and 1 × 10 16 ions/cm 2 doses are 75, 71, 62 and 16 K, respectively. On the other hand, Bi 2Sr 1.4Ca 1.8Cu 2.2O y, Tc end points for 0, 1 × 10 12 and 1 × 10 13 ions/cm 2 doses are 78, 76 and 54 K, respectively, c lattice constant increases were observed for the implanted films. It is confirmed that the superconducting characteristics for films, are recovered by anneaing in O 2 atomosphere. Moreover, microcrystal growth caused by annealing the implanted YBa 2Cu 3O x film was observed on the surface.

  7. The influence of silver-ion doping using ion implantation on the luminescence properties of Er-Yb silicate glasses

    NASA Astrophysics Data System (ADS)

    Stanek, S.; Nekvindova, P.; Svecova, B.; Vytykacova, S.; Mika, M.; Oswald, J.; Mackova, A.; Malinsky, P.; Spirkova, J.

    2016-03-01

    A set of zinc-silicate glasses with different ratios of erbium and ytterbium was fabricated. To achieve Ag-rich thin films in a sub-surface layer, ion-implantation technique at an energy of 1.2 MeV and 1.7 MeV with a fluence of 1 × 1016 cm-2 was used. Post-implantation annealing was also applied. Changes in the spectroscopic and lasing properties of erbium ions as a function of implantation fluence of silver were studied with the aim to assess the positive effect of silver as a sensitiser of erbium luminescence. Therefore, absorption spectra in the visible range as well as luminescence spectra in the near-infrared range were measured and partially also the 4I11/2-4I15/2 transition of the erbium ion was studied. The results showed that silver positively influenced luminescence intensity at 1530 nm by increasing it almost three times. The biggest increase was achieved in glass with the highest concentration of erbium. Luminescence lifetime was not significantly influenced by the presence of silver and still remained around 10 ms.

  8. Integration of Ion Implantation with Scanning ProbeAlignment

    SciTech Connect

    Persaud, A.; Rangelow, I.W.; Schenkel, T.

    2005-03-01

    We describe a scanning probe instrument which integrates ion beams with imaging and alignment functions of a piezo resistive scanning probe in high vacuum. Energetic ions (1 to a few hundred keV) are transported through holes in scanning probe tips [1]. Holes and imaging tips are formed by Focused Ion Beam (FIB) drilling and ion beam assisted thin film deposition. Transport of single ions can be monitored through detection of secondary electrons from highly charged dopant ions (e. g., Bi{sup 45+}) enabling single atom device formation. Fig. 1 shows SEM images of a scanning probe tip formed by ion beam assisted Pt deposition in a dual beam FIB. Ion beam collimating apertures are drilled through the silicon cantilever with a thickness of 5 {micro}m. Aspect ratio limitations preclude the direct drilling of holes with diameters well below 1 {micro}m, and smaller hole diameters are achieved through local thin film deposition [2]. The hole in Fig. 1 was reduced from 2 {micro}m to a residual opening of about 300 nm. Fig. 2 shows an in situ scanning probe image of an alignment dot pattern taken with the tip from Fig. 1. Transport of energetic ions through the aperture in the scanning probe tip allows formation of arbitrary implant patterns. In the example shown in Fig. 2 (right), a 30 nm thick PMMA resist layer on silicon was exposed to 7 keV Ar{sup 2+} ions with an equivalent dose of 10{sup 14} ions/cm{sup 2} to form the LBL logo. An exciting goal of this approach is the placement of single dopant ions into precise locations for integration of single atom devices, such as donor spin based quantum computers [3, 4]. In Fig. 3, we show a section of a micron size dot area exposed to a low dose (10{sup 11}/cm{sup 2}) of high charge state dopant ions. The Bi{sup 45+} ions (200 keV) were extracted from a low emittance highly charged ions source [5]. The potential energy of B{sup 45+}, i. e., the sum of the binding energies required to remove the electrons, amounts to 36 ke

  9. Effect of plasma immersion ion implantation in TiNi implants on its interaction with animal subcutaneous tissues

    NASA Astrophysics Data System (ADS)

    Lotkov, Aleksandr I.; Kashin, Oleg A.; Kudryavtseva, Yuliya A.; Shishkova, Darya K.; Krukovskii, Konstantin V.; Kudryashov, Andrey N.

    2016-08-01

    Here we investigated in vivo interaction of Si-modified titanium nickelide (TiNi) samples with adjacent tissues in a rat subcutaneous implant model to assess the impact of the modification on the biocompatibility of the implant. Modification was performed by plasma immersion ion processing, which allows doping of different elements into surface layers of complex-shaped articles. The aim of modification was to reduce the level of toxic Ni ions on the implant surface for increasing biocompatibility. We identified a thin connective tissue capsule, endothelial cells, and capillary-like structures around the Si-modified implants both 30 and 90 days postimplantation. No signs of inflammation were found. In conclusion, modification of TiNi samples with Si ions increases biocompatibility of the implant.

  10. Metal ion implantation for large scale surface modification

    SciTech Connect

    Brown, I.G.

    1992-10-01

    Intense energetic beams of metal ions can be produced by using a metal vapor vacuum arc as the plasma discharge from which the ion beam is formed. We have developed a number of ion sources of this kind and have built a metal ion implantation facility which can produce repetitively pulsed ion beams with mean ion energy up to several hundred key, pulsed beam current of more than an ampere, and time averaged current of several tens of milliamperes delivered onto a downstream target. We've also done some preliminary work on scaling up this technology to very large size. For example, a 50-cm diameter (2000 cm[sup 2]) set of beam formation electrodes was used to produce a pulsed titanium beam with ion current over 7 amperes at a mean ion energy of 100 key. Separately, a dc embodiment has been used to produce a dc titanium ion beam with current over 600 mA, power supply limited in this work, and up to 6 amperes of dc plasma ion current was maintained for over an hour. In a related program we've developed a plasma immersion method for applying thin metallic and compound films in which the added species is atomically mixed to the substrate. By adding a gas flow to the process, well-bonded compound films can also be formed; metallic films and multilayers as well as oxides and nitrides with mixed transition zones some hundreds of angstroms thick have been synthesized. Here we outline these parallel metal-plasma-based research programs and describe the hardware that we've developed and some of the surface modification research that we've done with it.

  11. Friction and Wear Properties of As-Deposited and Carbon Ion-Implanted Diamond Films

    NASA Technical Reports Server (NTRS)

    Miyoshi, Kazuhisa

    1996-01-01

    Recent work on the friction and wear properties of as-deposited and carbon ion-implanted diamond films was reviewed. Diamond films were produced by the microwave plasma chemical vapor deposition (CVD) technique. Diamond films with various grain sizes and surface roughnesses were implanted with carbon ions at 60 keV ion energy, resulting in a dose of 1.2 x 10(exp 17) carbon ions per cm(exp 2). Various analytical techniques, including Raman spectroscopy, proton recoil analysis, Rutherford backscattering, transmission and scanning electron microscopy, X-ray photoelectron spectroscopy, and X-ray diffraction, were utilized to characterize the diamond films. Sliding friction experiments were conducted with a polished natural diamond pin in contact with diamond films in the three environments: humid air (40% relative humidity), dry nitrogen (less than 1 percent relative humidity), and ultrahigh vacuum (10(exp -7) Pa). The CVD diamond films indeed have friction and wear properties similar to those of natural diamond in the three environments. The as-deposited, fine-grain diamond films can be effectively used as self-lubricating, wear-resistant coatings that have low coefficients of friction (0.02 to 0.04) and low wear rates (10(exp -7) to lO(exp -8) mm(exp 3) N(exp -1) m(exp -1)) in both humid air and dry nitrogen. However, they have high coefficients of friction (1.5 to 1.7) and a high wear rate (10(exp -4) mm(exp 7) N(exp -1) m(exp -1)) in ultrahigh vacuum. The carbon ion implantation produced a thin surficial layer (less than 0.1 micron thick) of amorphous, non-diamond carbon on the diamond films. In humid air and dry nitrogen, the ion-implanted, fine and coarse-grain diamond films have a low coefficient of friction (around 0.1) and a low wear rate (10(exp -7) mm(exp 3) N(exp -1) m(exp-1)). Even in ultrahigh vacuum, the presence of the non-diamond carbon layer reduced the coefficient of friction of fine-grain diamond films to 0.1 or lower and the wear rate to 10(exp -6

  12. Single ion implantation for single donor devices using Geiger mode detectors

    NASA Astrophysics Data System (ADS)

    Bielejec, E.; Seamons, J. A.; Carroll, M. S.

    2010-02-01

    Electronic devices that are designed to use the properties of single atoms such as donors or defects have become a reality with recent demonstrations of donor spectroscopy, single photon emission sources, and magnetic imaging using defect centers in diamond. Ion implantation, an industry standard for atom placement in materials, requires augmentation for single ion capability including a method for detecting a single ion arrival. Integrating single ion detection techniques with the single donor device construction region allows single ion arrival to be assured. Improving detector sensitivity is linked to improving control over the straggle of the ion as well as providing more flexibility in lay-out integration with the active region of the single donor device construction zone by allowing ion sensing at potentially greater distances. Using a remotely located passively gated single ion Geiger mode avalanche diode (SIGMA) detector we have demonstrated 100% detection efficiency at a distance of >75 µm from the center of the collecting junction. This detection efficiency is achieved with sensitivity to ~600 or fewer electron-hole pairs produced by the implanted ion. Ion detectors with this sensitivity and integrated with a thin dielectric, for example a 5 nm gate oxide, using low energy Sb implantation would have an end of range straggle of <2.5 nm. Significant reduction in false count probability is, furthermore, achieved by modifying the ion beam set-up to allow for cryogenic operation of the SIGMA detector. Using a detection window of 230 ns at 1 Hz, the probability of a false count was measured as ~10-1 and 10-4 for operation temperatures of ~300 K and ~77 K, respectively. Low temperature operation and reduced false, 'dark', counts are critical to achieving high confidence in single ion arrival. For the device performance in this work, the confidence is calculated as a probability of >98% for counting one and only one ion for a false count probability of 10-4 at

  13. Athermal nature of impact exerted by ultraviolet radiation on the accumulation of radiation defects during ion implantation into silicon

    NASA Astrophysics Data System (ADS)

    Danilin, A. B.; Erokhin, Yu. N.; Mordkovich, V. N.; Hatzopoulos, N.; Hemment, P. L. F.

    1992-06-01

    The effect of UV irradiation during ion implantation on the reordering of defects observed on Soviet grown Czochralski silicon was repeated with Ar + implantation on Mosanto Czochralski silicon. To investigate the nature of this effect, P + ions with energy 90 keV, dose 1.0 × 10 14 cm -2, and ion beam current density 0.012 μA/cm 2 were implant d into a silicon target which was cooled to liquid nitrogen temperature. During implantation some samples were subjected to photoexcitation using radiation from a mercury high-pressure lamp. The Infrared Fourier transmission spectroscopy and Rutherford backscattering techniques have shown that the level of damage of the silicon implanted under the extra excitation proves to be considerably lower than that for the silicon implanted in a conventional way. The sheet resistance of the samples subjected to low temperature annealing also differs for the two types of samples. Therefore, it has been demonstrated that impact exerted by photoexcitation during implantation is athermal in nature.

  14. Stoichiometric disturbances in compound semiconductors due to ion implantation

    NASA Technical Reports Server (NTRS)

    Avila, R. E.; Fung, C. D.

    1986-01-01

    A method is developed to calculate the depth distribution of the local stoichiometric disturbance (SD) resulting from ion implantation in binary-compound substrates. The calculation includes first-order recoils considering projected range straggle of projectiles and recoils and lateral straggle of recoils. The method uses tabulated final-range statistics to infer the projectile range distributions at intermediate energies. This approach greatly simplifies the calculation with little compromise on accuracy as compared to existing procedures. As an illustration, the SD profile is calculated for implantation of boron, silicon, and aluminum in silicon carbide. The results for the latter case suggest that the SD may be responsible for otherwise unexplained distortions in the annealed aluminum profile. A comparison with calculations by other investigators using the Boltzmann transport equation shows good agreement.

  15. Ion implantation induced modification of structural and magnetic properties of perpendicular media

    NASA Astrophysics Data System (ADS)

    Gaur, Nikita; Piramanayagam, S. N.; Maurer, S. L.; Nunes, R. W.; Steen, S.; Yang, H.; Bhatia, C. S.

    2011-09-01

    This study reports the effects of implanting various doses of boron (11B+) and argon (40Ar+) ions into the recording layer and the soft underlayer of CoCrPt-SiO2-based perpendicular recording media. Implantation of a lower dose of boron ions (1011 ions cm-2) in the recording layer was found to reduce the out-of-plane coercivity, whereas no changes in the coercivity were observed when they were implanted into the soft underlayer. In the case of argon ions, lower dose implantation did not show any changes in the coercivity, irrespective of the implanted layer. However, higher dose implantations (1016 ions cm-2) of all the species were found to cause a reduction in coercivity, irrespective of the implanted layer. The reduction in coercivity was more significant when the ions were implanted in the recording layer compared with the case of implantation in the soft underlayer. X-ray diffraction (XRD) results on samples where argon was implanted in the recording layer showed a strong shift in the position of Co (0 0 .2) peaks, indicating an increase in the 'c' parameter. The shift is explained, on the basis of x-ray photoelectron spectroscopy, to be arising from intra-layer mixing at the CoCrPt-SiO2/Ru interface. Magnetic force microscopy images indicated an increase in domain size arising from the ion implantation.

  16. Diamond-like carbon produced by plasma source ion implantation as a corrosion barrier

    SciTech Connect

    Lillard, R.S.; Butt, D.P.; Taylor, T.N.; Walter, K.C.; Nastasi, M.

    1998-03-01

    There currently exists a broad range of applications for which the ability to produce an adherent, hard, wear and, corrosion-resistant coating plays a vital role. These applications include engine components, orthopedic devices, textile manufacturing components, hard disk media, optical coatings, and cutting and machining tools (e.g., punches, taps, scoring dies, and extrusion dies). Ion beam processing can play an important role in all of these technologies. Plasma source ion implantation (PSII) is an emerging technology which has the potential to overcome the limitations of conventional ion implantation by: (1) reducing the time and expense for implanting onto complex shapes and large areas and (2) extending the thickness of the modification zone through ion beam enhanced plasma growth of surface coatings. In PSII, targets are placed directly in a plasma source and then pulse biased to produce a non-line-of-sight process for complex-shaped targets without complex fixturing. If the pulse bias is a relatively high negative potential (20 to 100 kV) ion implantation will result. If however, a low voltage (50--1,200 eV) high duty cycle pulse bias is applied, film deposition from the chamber gas will result, thereby increasing the extent of the surface modification into the 1--10 micron regime. To evaluate the potential for DLC to be used as a corrosion barrier, Electrochemical Impedance Spectroscopy (EIS) and traditional electrochemistry techniques were used to investigate the breakdown mechanism in chloride and nonchloride containing environments. The effect of surface preparation on coating breakdown was also evaluated.

  17. Ultrasound-guided implantation techniques in treatment of prostate cancer

    SciTech Connect

    Carter, S.S.; Torp-Pedersen, S.T.; Holm, H.H. )

    1989-11-01

    Percutaneous ultrasound-guided interstitial radiotherapy is an attractive and elegant technique for the administration of high-dose local radiotherapy to the prostate. The complications of seed implantation are those associated with the radiation rather than with the technique of implantation. However, radiotherapy has not provided impressive local control of the disease or prolonged survival. The poor disease control was not attributed to poor seed placement, but rather to the inadequacy of {sup 125}I in controlling the cancer. The essence of nonsurgical treatment for prostate cancer is the use of effective imaging. Experience in the field of minimally invasive surgery has shown that ultrasound is the ideal imaging system for targeting treatments because of its ease of use and the absence of adverse effects. As the newer techniques of implantation come to be accepted, it is hoped that the complications of rectal and bladder radiation injury will decrease and the therapeutic benefits increase. The clinical trials required to define the precise role of each of the modalities of treatment must take nodal staging into account and must be compared with the gold standard of radical prostatectomy in the treatment of early confined disease.

  18. Experimental investigation of plasma-immersion ion implantation treatment for biocompatible polyurethane implants production

    NASA Astrophysics Data System (ADS)

    Iziumov, R. I.; Beliaev, A. Y.; Kondyurina, I. V.; Shardakov, I. N.; Kondyurin, A. V.; Bilek, M. M.; McKenzie, D. R.

    2016-04-01

    Modification of the surface layer of polyurethane with plasma-immersion ion implantation (PIII) and studying its physical and chemical changes have been discussed in this paper. The goal of the research was to obtain carbonized layer allowing creating biocompatible polyurethane implants. The experiments of PIII treatment in various modes were performed. The investigation of the modified surface characteristics was carried out by observing the kinetics of free surface energy for two weeks after treatment. The regularities between treatment time and the level of free surface energy were detected. The explanation of high energy level was given through the appearance of free radicals in the surface layer of material. The confirmation of the chemical activation of the polyurethane surface after PIII treatment was obtained.

  19. Doping of Ga2O3 bulk crystals and NWs by ion implantation

    NASA Astrophysics Data System (ADS)

    Lorenz, K.; Peres, M.; Felizardo, M.; Correia, J. G.; Alves, L. C.; Alves, E.; López, I.; Nogales, E.; Méndez, B.; Piqueras, J.; Barbosa, M. B.; Araújo, J. P.; Gonçalves, J. N.; Rodrigues, J.; Rino, L.; Monteiro, T.; Villora, E. G.; Shimamura, K.

    2014-03-01

    Ga2O3 bulk single crystals have been implanted with 300 keV Europium ions to fluences ranging from 1×1013 to 4×1015 at/cm2. The damage build-up and Eu-incorporation was assessed by Rutherford Backscattering Spectrometry in the channeling mode (RBS/C). RBS/C results suggest that implantation causes a mixture of defect clusters and extended defects such as dislocations. Amorphisation starts at the surface for fluences around 1×1015 at/cm2 and then proceeds to deeper regions of the sample with increasing fluence. Amorphous regions and defect clusters are efficiently removed during rapid thermal annealing at ~1100 °C however, Eu diffuses towards the surface. Nevertheless, Eu ions are optically activated and show cathodoluminescence at room temperature. Results in bulk samples are compared to those in Eu-implanted Ga2O3 nanowires and despite strong similarities in the structural properties differences were found in the optical activation. Furthermore, damage and dopant incorporation studies were performed using the Perturbed Angular Correlation technique, which allows probing the immediate lattice surroundings of an implanted radioactive probe at the atomic level.

  20. GaAs transistors formed by Be or Mg ion implantation

    NASA Technical Reports Server (NTRS)

    Hunsperger, R. G.; Marsh, O. J.

    1974-01-01

    N-p-n transistor structures have been formed in GaAs by implanting n-type substrates with Be ions to form base regions and then implanting them with 20-keV Si ions to form emitters. P-type layers have been produced in GaAs by implantation of either Mg or Be ions, with substrate at room temperature, followed by annealing at higher temperatures.

  1. Antibacterial PVD coatings doped with silver by ion implantation

    NASA Astrophysics Data System (ADS)

    Osés, J.; Palacio, J. F.; Kulkarni, S.; Medrano, A.; García, J. A.; Rodríguez, R.

    2014-08-01

    The antibacterial effect of certain metal ions, like silver, has been exploited since antiquity. Obviously, the ways to employ the biocide activity of this element have evolved throughout time and it is currently used in a wide range of clinical applications. The work presented here reports the results of an investigation focused on combining the protective properties of PVD coatings with the biocide property of silver, applied by ion implantation. For this purpose, chromium nitride layers were doped with silver implanted at two different doses (5 × 1016 and 1 × 1017 ion/cm2) at 100 keV of energy and perpendicular incidence. Full characterization of the coatings was performed to determine its topographical and mechanical properties. The concentration profile of Ag was analyzed by GD-OES. The thickness of the layers, nano-hardness, roughness, wear resistance and coefficient of friction were measured. Finally, the anti-bacterial efficacy of the coatings was determined following the JIS Z-2801:2010 Standard. The results provide clear insights into the efficacy of silver for antibacterial purposes, as well as on its influence in the mechanical and tribological behaviour of the coatings matrix.

  2. Ferromagnetism in ion implanted amorphous and nanocrystalline MnxGe1-x

    NASA Astrophysics Data System (ADS)

    Verna, A.; Ottaviano, L.; Passacantando, M.; Santucci, S.; Picozzi, P.; D'Orazio, F.; Lucari, F.; de Biase, M.; Gunnella, R.; Berti, M.; Gasparotto, A.; Impellizzeri, G.; Priolo, F.

    2006-08-01

    The structural, electronic, and magnetic properties of a MnxGe1-x alloy prepared through room-temperature ion implantation ( 100keV , 2×1016ions/cm2 ) and subsequent 400°C annealing have been investigated with several experimental techniques. The as-implanted sample shows a quasi-Gaussian Mn concentration depth profile with a projected range (peak Mn concentration x≃12at./% ) at 55nm and end of range at 140nm . The structural investigation shows that the overall implanted Ge layer is amorphous. In particular, up to a depth of 60nm , the implanted layer is also porous and oxidized, whereas the deepest implanted region (60-140nm) is purely composed of amorphous Ge with Mn atoms diluted in it. This sample manifests magnetic hysteresis up to 20K and a strong nonlinear S-shaped magnetic response up to 150K . Upon annealing at 400°C , the top porous layer remains essentially amorphous, whereas partial reconstruction into Ge nanocrystals ( ˜10nm in diameter) occurs in the 60-140-nm -deep implanted region. Part of the Mn atoms, mainly belonging to the top porous layer, further diffuses toward the surface and forms chemical bonds with O contaminants, becoming magnetically inactive. The other Mn atoms, mainly in the region between 60 and 140nm from the surface, remain trapped in the residual amorphous matrix or in the Ge nanocrystals, whereas formation of Mn-Ge extrinsic phases (like Mn11Ge8 and Mn5Ge3 ) is excluded. The magnetic response of the annealed sample originates from the existence of a soft and a harder magnetic component, assigned to the dilution of Mn atoms in residual amorphous Ge and Ge nanocrystals, respectively. The hard component, attributable to a MnxGe1-x diluted magnetic semiconductor in nanocrystalline form, manifests magnetic hysteresis up to above 250K .

  3. Ion implantation challenges in the drive towards 64 Mb and 256 Mb memory cell type devices

    NASA Astrophysics Data System (ADS)

    Giles, Alan D.; van der Steege, Anton

    1991-04-01

    Ion implantation techniques will be critical in the production of evermore complex devices, with major challenges for the device designer in utilising available techniques and those that are potentially available. Equally difficult challenges face the equipment designer in judging which technologies are required for future devices and welding these requirements into a reliable, productionworthy fabrication tool, capable of meeting or exceeding the automation and up-time expectations of the wafer fabrication managers. High yield and consistent performance on the wafer continue to be paramount. This paper will review these challenges from the equipment suppliers' viewpoint and in particular the new technology needs and cost of ownership issues.

  4. PIXE and micro-PIXE studies of ion release around endosseous implants in animals

    NASA Astrophysics Data System (ADS)

    Egeni, G. P.; Jaksic, M.; Moschini, G.; Passi, P.; Piattelli, A.; Rossi, P.; Rudello, V.; Tauro, L.

    1996-04-01

    The so-called "osseointegration" of oral and orthopedic implants means that newly-formed bone embeds the alloplastic implant materials allowing long-term clinical success. Commercially pure smooth titanium, rough titanium (sand blasted or plasma spray coated), hydroxylapatite and other coatings present different patterns, especially in the early healing phase after surgery. PIXE and micro-PIXE analysis are to be considered effective techniques to measure ion diffusion at the implant-bone interface, and to evaluate the possible diffusion of metal into the organism. Investigations were carried out in rabbits, both with PIXE and micro-PIXE, to evaluate a possible release of titanium from implants into the tissues and to measure other elements at the bone-implant border. Preliminary results suggest that a minor diffusion of titanium exists, even if probably without any significant clinical disturbance. Indeed, there is some evidence of initial titanium accumulation in some organs after six months. A possible deposition of calcium and phosphorus on the metal might indicate a good biological behavior of titanium.

  5. Dose Control System in the Optima XE Single Wafer High Energy Ion Implanter

    SciTech Connect

    Satoh, Shu; Yoon, Jongyoon; David, Jonathan

    2011-01-07

    Photoresist outgassing can significantly compromise accurate dosimetry of high energy implants. High energy implant even at a modest beam current produces high beam powers which create significantly worse outgassing than low and medium energy implants and the outgassing continues throughout the implant due to the low dose in typical high energy implant recipes. In the previous generation of high energy implanters, dose correction by monitoring of process chamber pressure during photoresist outgassing has been used. However, as applications diversify and requirements change, the need arises for a more versatile photoresist correction system to match the versatility of a single wafer high energy ion implanter. We have successfully developed a new dosimetry system for the Optima XE single wafer high energy ion implanter which does not require any form of compensation due to the implant conditions. This paper describes the principles and performance of this new dose system.

  6. Dose Control System in the Optima XE Single Wafer High Energy Ion Implanter

    NASA Astrophysics Data System (ADS)

    Satoh, Shu; Yoon, Jongyoon; David, Jonathan

    2011-01-01

    Photoresist outgassing can significantly compromise accurate dosimetry of high energy implants. High energy implant even at a modest beam current produces high beam powers which create significantly worse outgassing than low and medium energy implants and the outgassing continues throughout the implant due to the low dose in typical high energy implant recipes. In the previous generation of high energy implanters, dose correction by monitoring of process chamber pressure during photoresist outgassing has been used. However, as applications diversify and requirements change, the need arises for a more versatile photoresist correction system to match the versatility of a single wafer high energy ion implanter. We have successfully developed a new dosimetry system for the Optima XE single wafer high energy ion implanter which does not require any form of compensation due to the implant conditions. This paper describes the principles and performance of this new dose system.

  7. B+ Ion Implanted n+ on P HgCdTe Photovoltaic Arrays

    NASA Astrophysics Data System (ADS)

    Shi, Yanli

    2005-10-01

    B+ ion implantation technology has been utilized to fabricate n+ on P HgCdTe photovoltaic arrays with the HgCdTe epitaxial materials grown by the liquid phase epitaxial method. The effects of implanting energy and dose on doping profile and approximate junction depth were calculated in detail; the calculated results are well consistent with the measurement results by the second ion mass spectrum experimental technique (SIMS). The 10×10 photodiode arrays in which each pixel size is nominally 20×20 μm2 and the pitch is 30 μm were made to investigate the electro-optic performance of devices. The device characterization such as array uniformity and optical crosstalk was nondestructively investigated using a scanning laser microscope. The two-dimensional maps of laser beam induced current (LBIC) signal have shown good uniformity for the fabricated arrays, and there is no optical crosstalk between the arrays for the B+ ion implantation conditions used at the implanting energy of 130 KeV and the dose of 2×1014 cm2. The primary performance of photodiodes the zero bias dynamic resistance junction area product R0A, infrared response spectrum, and the detectivity D* have been measured, and the typical values for the test photodiodes with cutoff wavelength of 9.2 μm measured at 77°K are: R0A = 13.5'Ω.cm2, average blackbody detectivity D* = 7.18×1010 cm Hz1/2W-1. By further optimizing the implantation conditions and the quality of materials, excellent performances of photovoltaic detectors can be expected.

  8. Turning an organic semiconductor into a low-resistance material by ion implantation

    NASA Astrophysics Data System (ADS)

    Fraboni, Beatrice; Scidà, Alessandra; Cosseddu, Piero; Wang, Yongqiang; Nastasi, Michael; Milita, Silvia; Bonfiglio, Annalisa

    2015-12-01

    We report on the effects of low energy ion implantation on thin films of pentacene, carried out to investigate the efficacy of this process in the fabrication of organic electronic devices. Two different ions, Ne and N, have been implanted and compared, to assess the effects of different reactivity within the hydrocarbon matrix. Strong modification of the electrical conductivity, stable in time, is observed following ion implantation. This effect is significantly larger for N implants (up to six orders of magnitude), which are shown to introduce stable charged species within the hydrocarbon matrix, not only damage as is the case for Ne implants. Fully operational pentacene thin film transistors have also been implanted and we show how a controlled N ion implantation process can induce stable modifications in the threshold voltage, without affecting the device performance.

  9. Model for ion-implantation-induced improvements of photoferroelectric imaging in lead lanthanum zirconate titanate ceramics

    SciTech Connect

    Peercy, P.S.; Land, C.E.

    1980-11-01

    Studies of photoferroelectric image storage in H-, He-, and, more recently, Ar-implanted /(PLZT) lead lanthanum zirconate titanate reveal that the photosensitivity can be significantly increased by ion implantation into the image storage surface. For example, the photosensitivity after implantation with 5 x 10/sup 14/ 500-keV Ar/cm/sup 2/ is increased by about three orders of magnitude over that of unimplanted PLZT. The increase in photosensitivity results from a decrease in dark conductivity and changes in the photoconductivity of the implanted layer. We present a phenomenological model which describes the photosensitivity enhancement obtained by ion implantation. This model takes into account both light- and ion- implantation-induced changes in conductivity and gives quantitative agreement with the measured changes in the coercive voltage with near-UV light intensity for ion-implantated PLZT.

  10. Structure analysis of bimetallic Co-Au nanoparticles formed by sequential ion implantation

    NASA Astrophysics Data System (ADS)

    Chen, Hua-jian; Wang, Yu-hua; Zhang, Xiao-jian; Song, Shu-peng; chen, Hong; Zhang, Ke; Xiong, Zu-zhao; Ji, Ling-ling; Dai, Hou-mei; Wang, Deng-jing; Lu, Jian-duo; Wang, Ru-wu; Zheng, Li-rong

    2016-08-01

    Co-Au alloy Metallic nanoparticles (MNPs) are formed by sequential ion implantation of Co and Au into silica glass at room temperature. The ion ranges of Au ions implantation process have been displayed to show the ion distribution. We have used the atomic force microscopy (AFM) and transmission electron microscopy (TEM) to investigate the formation of bimetallic nanoparticles. The extended X-ray absorption fine structure (EXAFS) has been used to study the local structural information of bimetallic nanoparticles. With the increase of Au ion implantation, the local environments of Co ions are changed enormously. Hence, three oscillations, respectively, Co-O, Co-Co and Co-Au coordination are determined.

  11. Productivity Improvement for the SHX--SEN's Single-Wafer High-Current Ion Implanter

    SciTech Connect

    Ninomiya, Shiro; Ochi, Akihiro; Kimura, Yasuhiko; Yumiyama, Toshio; Kudo, Tetsuya; Kurose, Takeshi; Kariya, Hiroyuki; Tsukihara, Mitsukuni; Ishikawa, Koji; Ueno, Kazuyoshi

    2011-01-07

    Equipment productivity is a critical issue for device fabrication. For ion implantation, productivity is determined both by ion current at the wafer and by utilization efficiency of the ion beam. Such improvements not only result in higher fabrication efficiency but also reduce consumption of both electrical power and process gases. For high-current ion implanters, reduction of implant area is a key factor to increase efficiency. SEN has developed the SAVING system (Scanning Area Variation Implantation with Narrower Geometrical pattern) to address this opportunity. In this paper, three variations of the SAVING system are introduced along with discussion of their effects on fab productivity.

  12. Cost estimates for commercial plasma source ion implantation

    SciTech Connect

    Rej, D.J. ); Alexander, R.B. )

    1994-07-01

    A semiempirical model for the cost of a commercial plasma source ion implantation (PSII) facility is presented. Amortized capital and operating expenses are estimated as functions of the surface area throughput [ital T]. The impact of secondary electron emission and batch processing time is considered. Treatment costs are found to decrease monotonically with [ital T] until they saturate at large [ital T] when capital equipment payback and space rental dominate the expense. A reasonably sized PSII treatment facility should be able to treat a surface area of 10[sup 4] m[sup 2] per year at a cost of $0.01 per cm[sup 2].

  13. Magnetic insulation of secondary electrons in plasma source ion implantation

    SciTech Connect

    Rej, D.J.; Wood, B.P.; Faehl, R.J.; Fleischmann, H.H.

    1993-09-01

    The uncontrolled loss of accelerated secondary electrons in plasma source ion implantation (PSII) can significantly reduce system efficiency and poses a potential x-ray hazard. This loss might be reduced by a magnetic field applied near the workpiece. The concept of magnetically-insulated PSII is proposed, in which secondary electrons are trapped to form a virtual cathode layer near the workpiece surface where the local electric field is essentially eliminated. Subsequent electrons that are emitted can then be reabsorbed by the workpiece. Estimates of anomalous electron transport from microinstabilities are made. Insight into the process is gained with multi-dimensional particle-in-cell simulations.

  14. In situ auger analysis of surface composition during high fluence ion implantation

    NASA Astrophysics Data System (ADS)

    Baldwin, D. A.; Sartwell, B. D.; Singer, I. L.

    1985-03-01

    A multi-technique ultrahigh vacuum (UHV) target chamber has been used to perform in situ Auger electron spectroscopic (AES) analysis during ion implantation and AES sputter depth profiling of the substrate within 1-2 min after implantation. Iron was implanted with 150 keV Ti + at a 45° angle of incidence in a target chamber with pressures ranging from 8 × 10 -9 Torr of residual gases up to 1 × 10 -5 Torr of intentionally admitted CO gas. A fluence of ∼1.0 × 10 16cm -2 was needed to sputter away the C-covered air-formed oxide. The implanted Ti reached the surface at the 1 at.% level by ∼1.5 × 10 16cm -2. With increasing fluence, the Ti surface concentration increased to ∼15 at.% at steady-state with a curve shape that was concave downward at all fluences. The surface C concentration was found to be proportional to that of Ti for implants in CO, supporting a vacuum carburization model. Substantial O surface concentration (15-20 at.%) was detected for these runs but depth profiles showed only carburization, not oxidation, of the implanted layer. Even in the best vacuum available (8 × 10 -9Torr), some carburization was observed and was attributed to residual gas absorption. An increase in Ti retained dose with increasing CO pressure has been observed but not yet independently confirmed. The Ti/Fe surface concentration ratio is higher for implants done in CO, and this is discussed in terms of modification of the sputter yield for Ti.

  15. Development of the implant surgical technique and assessment rating system

    PubMed Central

    Park, Jung-Chul; Hwang, Ji-Wan; Lee, Jung-Seok; Jung, Ui-Won; Choi, Seong-Ho; Cho, Kyoo-Sung; Chai, Jung-Kiu

    2012-01-01

    Purpose There has been no attempt to establish an objective implant surgical evaluation protocol to assess residents' surgical competence and improve their surgical outcomes. The present study presents a newly developed assessment and rating system and simulation model that can assist the teaching staffs to evaluate the surgical events and surgical skills of residents objectively. Methods Articles published in peer-reviewed English journals were selected using several scientific databases and subsequently reviewed regarding surgical competence and assessment tools. Particularly, medical journals reporting rating and evaluation protocols for various types of medical surgeries were thoroughly analyzed. Based on these studies, an implant surgical technique assessment and rating system (iSTAR) has been developed. Also, a specialized dental typodont was developed for the valid and reliable assessment of surgery. Results The iSTAR consists of two parts including surgical information and task-specific checklists. Specialized simulation model was subsequently produced and can be used in combination with iSTAR. Conclusions The assessment and rating system provided may serve as a reference guide for teaching staffs to evaluate the residents' implant surgical techniques. PMID:22413071

  16. Metal ion implantation in inert polymers for strain gauge applications

    NASA Astrophysics Data System (ADS)

    Di Girolamo, Giovanni; Massaro, Marcello; Piscopiello, Emanuela; Tapfer, Leander

    2010-10-01

    Metal ion implantation in inert polymers may produce ultra-thin conducting films below the polymer surface. These subsurface films are promising structures for strain gauge applications. To this purpose, polycarbonate substrates were irradiated at room temperature with low-energy metal ions (Cu + and Ni +) and with fluences in the range between 1 × 10 16 and 1 × 10 17 ions/cm 2, in order to promote the precipitation of dispersed metal nanoparticles or the formation of a continuous thin film. The nanoparticle morphology and the microstructural properties of polymer nanocomposites were investigated by glancing-incidence X-ray diffraction and transmission electron microscopy (TEM) measurements. At lower fluences (<5 × 10 16 ions/cm 2) a spontaneous precipitation of spherical-shaped metal nanoparticles occurred below the polymer top-surface (˜50 nm), whereas at higher fluences the aggregation of metal nanoparticles produced the formation of a continuous polycrystalline nanofilm. Furthermore, a characteristic surface plasmon resonance peak was observed for nanocomposites produced at lower ion fluences, due to the presence of Cu nanoparticles. A reduced electrical resistance of the near-surface metal-polymer nanocomposite was measured. The variation of electrical conductivity as a function of the applied surface load was measured: we found a linear relationship and a very small hysteresis.

  17. Ion implantation of silicon at the nanometer scale

    SciTech Connect

    Bianconi, Marco; Bergamini, Fabio; Cristiani, Stefano; Lulli, Giorgio

    2007-10-01

    SiO{sub 2} layers ({approx}0.5 {mu}m thick) thermally grown on (100) Si were irradiated with 12.5 MeV Ti ions at 10{sup 9} cm{sup -2} fluence, and subsequently exposed to the HF vapor, in order to selectively etch the latent tracks generated by the passage of swift ions. Nearly cylindrical nanoholes having diameters as small as 25 nm, with an average value of 54{+-}5 nm, were generated by this procedure. The nanopatterned SiO{sub 2} layer served as a mask for selective amorphization of the underlying Si, achieved by implantation with 180 keV Ar{sup +} ions at a fluence of 2.0x10{sup 15} cm{sup -2}. Dip in aqueous HF solution was then performed to selectively etch ion amorphized Si, thus transferring the nanometric pattern of the SiO{sub 2} mask to the underlying substrate. As expected, the maximum depth of amorphizazion in Si, and consequently of etching depth, decreases when the hole radius decreases below values of the order of the lateral ion straggling. The effect has been characterized and investigated by the comparison of experiments and three dimensional Monte Carlo simulations.

  18. Ion-implanted GaN junction field effect transistor

    SciTech Connect

    Zolper, J.C.; Shul, R.J.; Baca, A.G.; Wilson, R.G.; Pearton, S.J.; Stall, R.A.

    1996-04-01

    Selective area ion implantation doping has been used to fabricate GaN junction field effect transistors (JFETs). {ital p}-type and {ital n}-type doping was achieved with Ca and Si implantation, respectively, followed by a 1150{degree}C rapid thermal anneal. A refractory W gate contact was employed that allows the {ital p}-gate region to be self-aligned to the gate contact. A gate turn-on voltage of 1.84 V at 1 mA/mm of gate current was achieved. For a {approximately}1.7 {mu}m{times}50 {mu}m JFET with a {minus}6 V threshold voltage, a maximum transconductance of 7 mS/mm at {ital V}{sub GS}={minus} 2V and saturation current of 33 mA/mm at {ital V}{sub GS}=0 V were measured. These results were limited by excess access resistance and can be expected to be improved with optimized {ital n}{sup +} implants in the source and drain regions. {copyright} {ital 1996 American Institute of Physics.}

  19. Ion-implanted high microwave power indium phosphide transistors

    NASA Technical Reports Server (NTRS)

    Biedenbender, Michael D.; Kapoor, Vik J.; Messick, Louis J.; Nguyen, Richard

    1989-01-01

    Encapsulated rapid thermal annealing (RTA) has been used in the fabrication of InP power MISFETs with ion-implanted source, drain, and active-channel regions. The MISFETs had a gate length of 1.4 microns. Six to ten gate fingers per device, with individual gate finger widths of 100 or 125 microns, were used to make MISFETs with total gate widths of 0.75, 0.8, or 1 mm. The source and drain contact regions and the channel region of the MISFETs were fabricated using Si implants in InP at energies from 60 to 360 keV with doses of (1-560) x 10 to the 12th/sq cm. The implants were activated using RTA at 700 C for 30 sec in N2 or H2 ambients using an Si3N4 encapsulant. The high-power high-efficiency MISFETs were characterized at 9.7 GHz, and the output microwave power density for the RTA conditions used was as high as 2.4 W/mm. For a 1-W input at 9.7 GHz gains up to 3.7 dB were observed, with an associated power-added efficiency of 29 percent and output power density 70 percent greater than that of GaAs MESFETs.

  20. Optical waveguides fabricated by nitrogen ion implantation in fused silica

    NASA Astrophysics Data System (ADS)

    Liu, Chun-Xiao; Fu, Li-Li; Zheng, Rui-Lin; Guo, Hai-Tao; Zhou, Zhi-Guang; Li, Wei-Nan; Lin, She-Bao; Wei, Wei

    2016-02-01

    We report on the fabrication of waveguides in fused silica using 4.5-MeV nitrogen ion implantation with a fluence of 5.0×1014 ions/cm2. The prism-coupling method was employed to measure the effective refractive indices of guiding modes at the wavelengths of 632.8 and 1539 nm. The effective refractive indices of the first few modes were higher than that of the substrate. The refractive index profiles at 632.8 and 1539 nm were reconstructed by the reflectivity calculation method. Positive index changes were induced in the waveguide layers. The end-face coupling method was used to measure the near-field light intensity distributions at the wavelength of 632.8 nm and the finite-difference beam propagation method was applied to simulate the guided mode profile at the wavelength of 1539 nm. The waveguide structures emerge as candidates for integrated photonic devices.

  1. Optically active surfaces formed by ion implantation and thermal treatment

    SciTech Connect

    Gea, L.A.; Boatner, L.A.; Evans, H.M.; Zuhr, R.

    1996-08-01

    Embedded VO{sub 2} precipitates have been formed in single-crystal sapphire by the ion co-implantation of vanadium and oxygen and subsequent thermal annealing. The embedded VO{sub 2} particles have been shown to exhibit an optical switching behavior that is comparable to that of continuous thin films. In this work, the mechanisms of formation of these optically active particles are investigated. It is shown that precipitation of the vanadium dioxide phase is favored when the thermal treatment is performed on an ion-damaged but still crystalline (rather than amorphized) Al{sub 2}O{sub 3} substrate. The best optical switching behavior is observed in this case, and this behavior is apparently correlated with a more-favorable dispersion of VO{sub 2} small particles inside the matrix.

  2. High power impulse magnetron sputtering and related discharges: scalable plasma sources for plasma-based ion implantation and deposition

    SciTech Connect

    Anders, Andre

    2009-09-01

    High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only when using `gasless? or pure self-sputtering. In many respects, processing with HIPIMS plasmas is similar to processing with filtered cathodic arc plasmas, though the former is easier to scale to large areas. Both ion implantation and etching (high bias voltage, without deposition) and thin film deposition (low bias, or bias of low duty cycle) have been demonstrated.

  3. Ion enhanced deposition by dual titanium and acetylene plasma immersion ion implantation

    NASA Astrophysics Data System (ADS)

    Zeng, Z. M.; Tian, X. B.; Chu, P. K.

    2003-01-01

    Plasma immersion ion implantation and deposition (PIII-D) offers a non-line-of-sight fabrication method for various types of thin films on steels to improve the surface properties. In this work, titanium films were first deposited on 9Cr18 (AISI440) stainless bearing steel by metal plasma immersion ion implantation and deposition (MePIII-D) using a titanium vacuum arc plasma source. Afterwards, carbon implantation and carbon film deposition were performed by acetylene (C2H2) plasma immersion ion implantation. Multiple-layered structures with superior properties were produced by conducting Ti MePIII-D + C2H2 PIII successively. The composition and structure of the films were investigated employing Auger electron spectroscopy and Raman spectroscopy. It is shown that the mixing for Ti and C atoms is much better when the target bias is higher during Ti MePIII-D. A top diamond-like carbon layer and a titanium oxycarbide layer are formed on the 9Cr18 steel surface. The wear test results indicate that this dual PIII-D method can significantly enhance the wear properties and decrease the surface friction coefficient of 9Cr18 steel.

  4. Friction and Wear Properties of As-deposited and Carbon Ion-implanted Diamond Films

    NASA Technical Reports Server (NTRS)

    Miyoshi, Kazuhisa

    1994-01-01

    Recent work on the friction and wear properties of as-deposited and carbon ion-implanted diamond films was reviewed. Diamond films were produced by the microwave plasma chemical vapor deposition (CVD) technique. Diamond films with various grain sizes and surface roughnesses were implanted with carbon ions at 60 ke V ion energy, resulting in a dose of 1.2310(exp 17) carbon ions/cm(exp 2). Various analytical techniques, including Raman spectroscopy, proton recoil analysis, Rutherford backscattering, transmission and scanning electron microscopy, x-ray photoelectron spectroscopy, and x-ray diffraction, were utilized to characterize the diamond films. Sliding friction experiments were conducted with a polished natural diamond pin in contact with diamond films in the three environments: humid air (40 percent relative humidity), dry nitrogen (less than 1 percent relative humidity), and ultrahigh vacuum (10(exp -7) Pa). The CVD diamond films indeed have friction and were properties similar to those of natural diamond in the three environments. The as-deposited, fine-grain diamond films can be effectively used as self-lubricating, wear-resistant coatings that have low coefficients of friction (0.02 to 0.04) and low wear rates (10(exp -7) to 10(exp -8)mm(exp 3)/N-m) in both humid air and dry nitrogen. However, they have high coefficients of friction (1.5 to 1.7) and a high wear rate (10(exp -4)mm(exp 3/N-m) in ultrahigh vacuum. The carbon ion implanation produced a thin surficial layer (less than 0.1 micron thick) of amorphous, nondiamond carbon on the diamond films. In humid air and dry nitrogen, the ion-implanted, fine- and coarse-grain diamond films have a low coefficient of friction (around 0.1) and a low wear rate (10(exp -7)mm(exp 3/N-m). Even in ultrahigh vacuum, the presence of the nondiamond carbon layer reduced the coefficient of friction of fine-grain diamond films to 0.1 or lower and the wear rate to 10(exp -6)mm(exp 3)/N-m. Thus, the carbon ion-implanted, fine

  5. Electrical measurements on ion-implanted LPCVD polycrystalline silicon films

    NASA Astrophysics Data System (ADS)

    Huang, Ruey-Shing; Cheng, Chin-Hsiung; Liu, J. C.; Lee, M. K.; Chen, C. T.

    1983-07-01

    The electrical conduction properties of ion implanted polycrystalline silicon films have been studied. The polysilicon films were deposited by pyrolysis of silane at 647°C in LPCVD system onto oxide-coated silicon wafers to a thickness of 0.6 μm. Dopants were itroducd by implanting with boron or phosphorus ions, accelerated to 145 keV; doses ranged from 1 × 10 12 cm -2 to 1 × 10 15 cm -2. Film resistivities spanning 8 orders of magnitude were obtained using this doping range. Current-voltage characteristics of polysilicon resistors were measured at temperatures ranging from 24 to 140°C. The associated barrier heights and activation energies were derived. The grain-boundary trapping states density was estimated to be 5 × 10 12 cm -2. We found that both dopant atom segregation and carrier trapping at the grain boundaries play important roles in polysilicon electrical conduction properties. However, within the dose range studies, the dopant atom segragation is most detrimental to the film conductivity for doses < 1 × 10 13 cm -2; as the dose is increased, carrier trapping effects become more pronounced for doses up to 5 × 10 14 cm -2. For doses ⩾ 5 × 10 14 cm -2, conduction due to carriers tunneling through the potential barriers at grain boundaries has to be considered.

  6. Influence of the chemical nature of implanted ions on the structure of a silicon layer damaged by implantation

    SciTech Connect

    Shcherbachev, K. D. Voronova, M. I.; Bublik, V. T.; Mordkovich, V. N. Pazhin, D. M.; Zinenko, V. I.; Agafonov, Yu. A.

    2013-12-15

    The influence of the implantation of silicon single crystals by fluorine, nitrogen, oxygen, and neon ions on the distribution of strain and the static Debye-Waller factor in the crystal lattice over the implanted-layer depth has been investigated by high-resolution X-ray diffraction. The density depth distribution in the surface layer of native oxide has been measured by X-ray reflectometry. Room-temperature implantation conditions have ensured the equality of the suggested ranges of ions of different masses and the energies transferred by them to the target. It is convincingly shown that the change in the structural parameters of the radiation-damaged silicon layer and the native oxide layer depend on the chemical activity of the implanted ions.

  7. Peripheral nerve regeneration through a silicone chamber implanted with negative carbon ions: Possibility to clinical application

    NASA Astrophysics Data System (ADS)

    Ikeguchi, Ryosuke; Kakinoki, Ryosuke; Tsuji, Hiroshi; Yasuda, Tadashi; Matsuda, Shuichi

    2014-08-01

    We investigated whether a tube with its inner surface implanted with negative-charged carbon ions (C- ions) would enable axons to extend over a distance greater than 10 mm. The tube was found to support nerves regenerating across a 15-mm-long inter-stump gap. We also investigated whether a C- ion-implanted tube pretreated with basic fibroblast growth factor (bFGF) promotes peripheral nerve regeneration. The C- ion implanted tube accelerated nerve regeneration, and this effect was enhanced by bFGF. Silicone treated with C- ions showed increased hydrophilic properties and cellular affinity, and axon regeneration was promoted with this increased biocompatibility.

  8. Studies of iron exposed to heavy ion implantation using positron annihilation spectroscopy

    NASA Astrophysics Data System (ADS)

    Horodek, P.; Dryzek, J.; Skuratov, V. A.

    2016-05-01

    Variable energy positron beam and positron lifetime spectroscopy were used to study pure iron exposed to irradiation with 167 MeV Xe26+ heavy ions with different doses of 1012, 1013, 5×1013, 1014 ions/cm2. The positron lifetime spectroscopy revealed the presence of large cluster of about 15-27 vacancies and dislocations. The dislocations are distributed at the depth of about 18 μm i.e. almost twice deeper than the ion implantation range from the surface exposed to the heavy ions implantation. Possible explanation is the long-range effect attributed to the ion implantation into materials.

  9. Near-surface recrystallization of the amorphous implanted layer of ion implanted 6H-SiC

    NASA Astrophysics Data System (ADS)

    Kuhudzai, R. J.; van der Berg, N. G.; Malherbe, J. B.; Hlatshwayo, T. T.; Theron, C. C.; Buys, A. V.; Botha, A. J.; Wendler, E.; Wesch, W.

    2014-08-01

    The recrystallization and subsequent crystal growth during annealing of amorphous surface layers on 6H-SiC produced by ion implantation is investigated. Amorphous surface layers were produced by ion implantation of 360 keV ions of iodine, silver, xenon, cesium and strontium into single crystalline 6H-silicon carbide samples. The ion fluence for all the implantations were in the order of 1016 cm-2. Vacuum annealing of the damaged silicon carbide samples was then performed. The microstructure of SiC surfaces before and after annealing was investigated using a high resolution field emission scanning electron microscope (SEM). SEM analysis was complimented by Atomic Force Microscopy (AFM). SEM images acquired by an in-lens detector using an accelerating voltage of 2 kV show nano-crystallites developed for all implanted samples after annealing. Larger and more faceted crystallites along with elongated thin crystallites were observed for iodine and xenon implanted 6H-SiC. Crystallites formed on surfaces implanted with strontium and cesium were smaller and less faceted. Strontium, silver and cesium implanted samples also exhibited more cavities on the surface. AFM was used to evaluate the effect of annealing on the surface roughness. For all the amorphous surfaces which were essentially featureless, the root mean square (rms) roughness was approximately 1 nm. The roughness increased to approximately 17 nm for the iodine implanted sample after annealing with the surface roughness below this value for all the other samples. AFM also showed that the largest crystals grew to heights of about 17, 20, 45, 50 and 65 nm for Sr, Cs, Ag, Xe and I implanted samples after annealing at 1200 °C for 5 h respectively. SEM images and AFM analysis suggest that iodine is more effective in promoting crystal growth during the annealing of bombardment-induced amorphous SiC layers than the rest of the ions we implanted. In samples of silicon carbide co-implanted with iodine and silver, few

  10. Structural modifications of alumina implanted with zirconium, copper, and titanium ions

    NASA Astrophysics Data System (ADS)

    Bigarré, J.; Fayeulle, S.; Tréheux, D.; Moncoffre, N.

    1997-10-01

    Microstructural modifications (amorphization, lattice deformation, phase transformations) in alumina induced by implantation of zirconium, copper, or titanium ions and by postimplantation thermal annealings were studied using grazing incidence x-ray diffraction. It was shown that the amount of lattice deformation and the type of damage resulting in the lattice depend on the ion implanted. When zirconium was implanted, the alumina lattice was highly deformed. Amorphization was observed when a high ion dose was implanted. Copper implantation led to the formation of gamma alumina. With titanium ions, very high strain was created and delta alumina was formed. After postimplantation annealings, lattices returned to their equilibrium state through crystallization of alpha alumina and precipitation of oxides of the implanted species (ZrO2, CuO and CuAl2O4, and TiO2).

  11. Annealing of damage and stability of implanted ions in ZnO crystals

    SciTech Connect

    Sonder, E.; Zuhr, R.A.; Valiga, R.E.

    1988-08-01

    The annealing of Bi, Cr, and Mn, implanted in ZnO, has been studied by Rutherford backscattering, ion channeling, and secondary ion mass spectroscopy. Implantation of approx.10/sup 16/ ions/cm/sup 2/ of any of these elements produces large concentrations of Zn interstitials, but no completely amorphous region. The temperature at which these interstitials anneal is a function of the implant species. Other defects produced by the implantation, which give rise to dechanneling and a consequent increased scattering probability in the tails of backscattering spectra, anneal at significantly higher temperature. This annealing is also a function of the implant species. Motion of the implant ions themselves does not occur when the interstitials anneal; it takes place above 700 /sup 0/C for Bi and Mn, and above 1000 /sup 0/C for Cr.

  12. Influence of Temperature on Nitrogen Ion Implantation of Ti6Al4V Alloy

    NASA Astrophysics Data System (ADS)

    Zhao, Qing; Zheng, Yong-zhen; Mo, Zhi-tao; Tang, De-li; Tong, Hong-hui; Geng, Man

    2001-04-01

    In order to achieve increased layer thickness, and wearing resistance, enhanced ion implantation with nitrogen has been carried out at temperatures of 100, 200, 400, and 600°C with a dose of 4×1018 ions cm-2. Using the Plasma Source Ion Implantation (PSII) device, specimens of Ti6Al4V alloy were implanted at elevated temperatures, using the ion flux as the heating source. Auger Electron Spectroscopy (AES), Scanning Electron Microscopy (SEM), x-ray Diffraction (XRD), micro-hardness measurements and pin-on-disk wearing tester were utilized to evaluate the surface property improvements. The thickness of the implanted layer increased by about an order of magnitude when the temperature was elevated from 100 to 600°C. Higher surface hardness and wearing resistance was also obtained in implantation under higher temperature. XRD image showed the presence of titanium nitrides on the implanted surface.

  13. A Luting Technique for Passive Fit of Implant-Supported Fixed Dentures.

    PubMed

    Menini, Maria; Dellepiane, Elena; Pera, Paolo; Bevilacqua, Marco; Pesce, Paolo; Pera, Francesco; Tealdo, Tiziano

    2016-01-01

    Several factors contribute to distortion of implant prostheses during fabrication and could prevent passive, accurate adaptation between implants and implant frameworks. The misfit between implants and restorative components may be significant and possibly lead to biologic or mechanical complications. The aim of this article is to describe a laboratory luting technique used to lute implant cylinders to metal frameworks in implant prostheses. This technique provides accurate, passive fits. According to this technique, titanium implant cylinders provided with corresponding external castable cylinders are used. Implant cylinders are screwed into the analogs in the master cast while the castable cylinders on top are splinted together using castable resin to realize a castable resin pattern. After casting, the framework is adjusted and cemented to the titanium cylinders on the master cast. Due to its ease and quickness of use and clinical efficiencies, this technique is deemed particularly useful in immediate loading rehabilitations. PMID:25898912

  14. Magnesium aluminate planar waveguides fabricated by C-ion implantation with different energies and fluences

    NASA Astrophysics Data System (ADS)

    Song, Hong-Lian; Yu, Xiao-Fei; Zhang, Lian; Wang, Tie-Jun; Qiao, Mei; Zhang, Jing; Liu, Peng; Wang, Xue-Lin

    2015-11-01

    We report on MgAl2O4 planar waveguides produced using different energies and fluences of C-ion implantation at room temperature. Based on the prism coupling method and end-face coupling measurements, light could propagate in the C-ion-implanted samples. The Raman spectra results indicate that the MgAl2O4 crystal lattice was damaged during the multi-energy C implantation process, whereas the absorption spectra were hardly affected by the C-ion implantation in the visible and infrared bands.

  15. Fluorescence effect of ion-implanted sapphire doped with Ag/Cu/Fe elements

    NASA Astrophysics Data System (ADS)

    Chen, Hua-jian; Wang, Yu-hua; Zhang, Xiao-jian; Dai, Hou-mei; Ji, Ling-ling; Wang, Ru-wu; Wang, Deng-jing; Lu, Jian-duo; Zheng, Li-rong

    2015-11-01

    The fluorescence effect and microstructure of the nanocomposite samples prepared by ion implantation have been studied in the subsurface area. Based on the UV-vis and VUV data, the luminescence properties of implanted samples have been presented and discussed. The research indicates that the surface plasma resonance has an impact on the fluorescence effect notably. In addition, the fluorescence performance of the substrates implanted with ions is related to the outermost electron number of the injection element. And SRIM is used to analyze the energy loss in the process of ion implantation.

  16. Modification of anti-bacterial surface properties of textile polymers by vacuum arc ion source implantation

    NASA Astrophysics Data System (ADS)

    Nikolaev, A. G.; Yushkov, G. Yu.; Oks, E. M.; Oztarhan, A.; Akpek, A.; Hames-Kocabas, E.; Urkac, E. S.; Brown, I. G.

    2014-08-01

    Ion implantation provides an important technology for the modification of material surface properties. The vacuum arc ion source is a unique instrument for the generation of intense beams of metal ions as well as gaseous ions, including mixed metal-gas beams with controllable metal:gas ion ratio. Here we describe our exploratory work on the application of vacuum arc ion source-generated ion beams for ion implantation into polymer textile materials for modification of their biological cell compatibility surface properties. We have investigated two specific aspects of cell compatibility: (i) enhancement of the antibacterial characteristics (we chose to use Staphylococcus aureus bacteria) of ion implanted polymer textile fabric, and (ii) the "inverse" concern of enhancement of neural cell growth rate (we chose Rat B-35 neuroblastoma cells) on ion implanted polymer textile. The results of both investigations were positive, with implantation-generated antibacterial efficiency factor up to about 90%, fully comparable to alternative conventional (non-implantation) approaches and with some potentially important advantages over the conventional approach; and with enhancement of neural cell growth rate of up to a factor of 3.5 when grown on suitably implanted polymer textile material.

  17. Ion Implanted Nanolayers in Alloys and Ceramic Coatings for Improved Resistance to High-Temperature Corrosion

    NASA Astrophysics Data System (ADS)

    Werner, Z.; Szymczyk, W.; Piekoszewski, J.

    Ion implantation effects on resistance of alloys and ceramic coatings to the high-temperature corrosion have been reviewed. The most significant results on implantation of reactive elements (Y, La, Ce and other rare earth elements) into alloys and aluminum, boron, silicon, tantalum, and titanium into ceramic coatings have been cited. Ion implantation affects not only the oxide growth rate, but also seems to modify the growth mechanism and the oxide structure.

  18. Ion implantation in compound semiconductors for high-performance electronic devices

    SciTech Connect

    Zolper, J.C.; Baca, A.G.; Sherwin, M.E.; Klem, J.F.

    1996-05-01

    Advanced electronic devices based on compound semiconductors often make use of selective area ion implantation doping or isolation. The implantation processing becomes more complex as the device dimensions are reduced and more complex material systems are employed. The authors review several applications of ion implantation to high performance junction field effect transistors (JFETs) and heterostructure field effect transistors (HFETs) that are based on compound semiconductors, including: GaAs, AlGaAs, InGaP, and AlGaSb.

  19. Plasma immersion ion implantation of nitrogen into H13 steel under moderate temperatures

    NASA Astrophysics Data System (ADS)

    Ueda, M.; Leandro, C.; Reuther, H.; Lepienski, C. M.

    2005-10-01

    Ion implantation of nitrogen into samples of tempered and quenched H13 steel was carried out by plasma immersion technique. A glow discharge plasma of nitrogen species was the ion source and the negative high voltage pulser provided 10-12 kV, 60 μs duration and 1.0-2.0 kHz frequency, flat voltage pulses. The temperatures of the samples remained between 300 and 450 °C, sustained solely by the ion bombardment. In some of the discharges, we used a N2 + H2 gas mixture with 1:1 ratio. PIII treatments as long as 3, 6, 9 and up to 12 h were carried out to achieve as thickest treated layer as possible, and we were able to reach over 20 μm treated layers, as a result of ion implantation and thermal (and possibly radiation enhanced) diffusion. The nitrogen depth profiles were obtained by GDOS (Glow Discharge Optical Spectroscopy) and the exact composition profiles by AES (Auger Electron Spectroscopy). The hardness of the treated surface was increased by more than 250%, reaching 18.8 GPa. No white layer was seen in this case. A hardness profile was obtained which corroborated a deep hardened layer, confirming the high efficacy of the moderate temperature PIII treatment of steels.

  20. Nitrogen Plasma Ion Implantation of Al and Ti alloys in the High Voltage Glow Discharge Mode

    NASA Astrophysics Data System (ADS)

    Oliveira, R. M.; Ueda, M.; Rossi, J. O.; Reuther, H.; Lepienski, C. M.; Beloto, A. F.

    2006-11-01

    Enhanced surface properties can be attained for aluminum and its alloys (mechanical and tribological) and Ti6Al4V (mainly tribological) by Plasma Immersion Ion Implantation (PIII) technique. The main problem here, more severe for Al case, is the rapid oxygen contamination even in low O partial pressure. High energy nitrogen ions during PIII are demanded for this situation, in order to enable the ions to pass through the formed oxide layer. We have developed a PIII system that can operate at energies in excess of 50keV, using a Stacked Blumlein (SB) pulser which can nominally provide up to 100 kV pulses. Initially, we are using this system in the High Voltage Glow Discharge (HVGD) mode, to implant nitrogen ions into Al5052 alloy with energies in the range of 30 to 50keV, with 1.5μs duration pulses at a repetition rate of 100Hz. AES, pin-on-disc, nanoindentation measurements are under way but x-ray diffraction results already indicated abundant formation of AlN in the surface for Al5052 treated with this HVGD mode. Our major aim in this PIII experiment is to achieve this difficult to produce stable and highly reliable AlN rich surface layer with high hardness, high corrosion resistance and very low wear rate.

  1. Superconducting properties of ion-implanted gold-silicon thin films

    SciTech Connect

    Jisrawi, N.M.

    1989-01-01

    The superconducting properties of thin Au{sub x}Si{sub 1{minus}x}, films prepared by ion beam implantation and ion beam mixing are studied. The films are prepared by evaporation of single Au layers on Si substrates and mixing them with Si, Ar, or Xe, or by Xe beam mixing of alternate multilayers of Au and Si sputtered on Al{sub 2}O{sub 3} substrates. The superconducting transition temperature and upper critical fields are determined by measuring the temperature and magnetic field dependence of resistivity. Temperatures as low as 20mK and magnetic fields as high as 8 T were used. Superconductivity in these films is discussed in connection with metastable metallic phases that are reportedly produced in the Au-Si system by high quenching rate preparation techniques like quenching from the vapor or the melt or ion implantation. Preliminary structural studies provide evidence for the existence of these phases and near-edge X-ray absorption and X-ray photoelectron spectroscopy measurements indicate a metallic type of bonding from which compound formation is inferred. The quality of the films is strongly dependent on the conditions of implantation. The maximum superconducting transition temperature attained is about 1.2 K. The upper critical fields have a maximum of 6T. An unusual double transition in the field dependence of resistivity is observed at low temperatures. The effect is very pronounced at compositions near x = 0.5 where the maximum {Tc} occurs. A model is presented to explain this result which invokes the properties of the metastable metallic phases and assumes the formation of more than two such phases in the same sample as the implantation dose increases. The Si-Au interface plays an important role in understanding the model and in interpreting the results of this thesis in general.

  2. Third Order Optical Nonlinearity of Colloidal Metal Nanoclusters Formed by MeV Ion Implantation

    NASA Technical Reports Server (NTRS)

    Sarkisov, S. S.; Williams, E.; Curley, M.; Ila, D.; Venkateswarlu, P.; Poker, D. B.; Hensley, D. K.

    1997-01-01

    We report the results of characterization of nonlinear refractive index of the composite material produced by MeV Ag ion implantation of LiNbO(sub 3) crystal (z-cut). The material after implantation exhibited a linear optical absorption spectrum with the surface plasmon peak near 430 nm attributed to the colloidal silver nanoclusters. Heat treatment of the material at 500 deg C caused a shift of the absorption peak to 550 nm. The nonlinear refractive index of the sample after heat treatment was measured in the region of the absorption peak with the Z-scan technique using a tunable picosecond laser source (4.5 ps pulse width).The experimental data were compared against the reference sample made of MeV Cu implanted silica with the absorption peak in the same region. The nonlinear index of the Ag implanted LiNbO(sub 3) sample produced at five times less fluence is on average two times greater than that of the reference.

  3. In vitro studies on silver implanted pure iron by metal vapor vacuum arc technique.

    PubMed

    Huang, Tao; Cheng, Yan; Zheng, Yufeng

    2016-06-01

    Pure iron has been verified as a promising biodegradable metal for absorbable cardiovascular stent usage. However, the degradation rate of pure iron is too slow. To accelerate the degradation of the surface of pure iron, silver ions were implanted into pure iron by metal vapor vacuum arc (MEVVA) source at an extracted voltage of 40keV. The implanted influence was up to 2×10(17)ions/cm(2). The composition and depth profiles, corrosion behavior and biocompatibility of Ag ion implanted pure iron were investigated. The implantation depths of Ag was around 60nm. The element Ag existed as Ag2O in the outermost layer, then gradually transited to metal atoms in zero valent state with depth increase. The implantation of Ag ions accelerated the corrosion rate of pure iron matrix, and exhibited much more uniform corrosion behavior. For cytotoxicity assessment, the implantation of Ag ions slightly decreased the viability of all kinds of cell lines used in these tests. The hemolysis rate of Ag ion implanted pure iron was lower than 2%, which was acceptable, whereas the platelet adhesion tests indicated the implantation of Ag ions might increase the risk of thrombosis. PMID:26925722

  4. Cell attachment of polypropylene surface-modified by COOH + ion implantation

    NASA Astrophysics Data System (ADS)

    Li, D. J.; Niu, L. F.

    2002-06-01

    Carboxy ion (COOH +) implantation was performed at the energy of 50 keV with fluences ranging from 1×10 14 to 1×10 15 ions/cm 2 at room temperature for polypropylene (PP). The effects of ion implantation on cells (immune macrophages, 3T3 mouse fibroblasts and human endothelial cells) were studied in vitro. Tests of cell attachment gave interesting results that the 3T3 mouse fibroblasts and human endothelial cells cultured on the surface of the implanted PP showed much better attachment and proliferation than that on pristine PP. At the same time, the COOH + ion implantation also induced low macrophage attachment with normal cellular morphology. Results of X-ray photoelectron spectroscopy (XPS) and Fourier-transform infrared (FTIR) analysis showed that COOH + ion implantation caused the rearrangement of chemical bonds and the formation of some new O-containing groups, which was responsible for the enhancement of the biocompatibility of PP.

  5. Comparison of Wear Resistance Mechanisms of Die Steel Implanted with C and mo Ions

    NASA Astrophysics Data System (ADS)

    Cheng, M. F.; Yang, J. H.; Luo, X. D.; Zhang, T. H.

    Mo and C ions extracted from a metal vapor vacuum arc ion source were implanted into the surface of die steel (H13) to compare the wear resistance mechanisms of the implanted samples, respectively. The concentration depth profiles of implanted ions were measured using Rutherford backscattering spectroscopy and calculated by a code called TRIDYN. The structures of the implanted steel were observed by X-ray photoelectron spectroscopy and grazing-angle X-ray diffraction, respectively. It was found that the conventional heat-treated H13 steel could not be further hardened by the subsequent implanted C ions, and the thickness of the implanted layer was not an important factor for the Mo and C ion implantation to improve the wear resistance of the H13 steel. Mo ion implantation could obviously improve the wear resistance of the steel at an extraction voltage of 48 kV and a dose of 5 × 1017cm-2 due to formation of a modification layer of little oxidation with Mo2C in the implanted surface.

  6. Processing of silicon solar cells by ion implantation and laser annealing

    NASA Technical Reports Server (NTRS)

    Minnucci, J. A.; Matthei, K. W.; Greenwald, A. C.

    1981-01-01

    Methods to improve the radiation tolerance of silicon cells for spacecraft use are described. The major emphasis of the program was to reduce the process-induced carbon and oxygen impurities in the junction and base regions of the solar cell, and to measure the effect of reduced impurity levels on the radiation tolerance of cells. Substrates of 0.1, 1.0 and 10.0 ohm-cm float-zone material were used as starting material in the process sequence. High-dose, low-energy ion implantation was used to form the junction in n+p structures. Implant annealing was performed by conventional furnace techniques and by pulsed laser and pulsed electron beam annealing. Cells were tested for radiation tolerance at Spire and NASA-LeRC. After irradiation by 1 MeV electrons to a fluence of 10 to the 16th power per sq cm, the cells tested at Spire showed no significant process induced variations in radiation tolerance. However, for cells tested at Lewis to a fluence of 10 to the 15th power per sq cm, ion-implanted cells annealed in vacuum by pulsed electron beam consistently showed the best radiation tolerance for all cell resistivities.

  7. Computer Simulation of Plasma Immersion Ion Implantation and Deposition

    NASA Astrophysics Data System (ADS)

    Miyagawa, Yoshiko; Tanaka, Masaaki; Nakadate, Hiroshi; Nakao, Setsuo; Miyagawa, Soji

    By using a newly developed simulation program "PEGASUS", plasma behavior was analyzed for the plasma immersion ion implantation and deposition (PIII&D). For plasma analysis of low pressure gas which is used in PIII&D, the software uses a particle in cell (PIC) method for the analysis of electric and magnetic fields and the motion of charged particles. A Monte Carlo collision method is used for collisions of ions, electrons and neutrals in the plasma, and the dynamic-SASAMAL code is used for the ion-solid surface interactions. Spatial distributions of potential, electron density and ion density together with the ion flux distribution on the target surface were calculated for the case where a negative pulse voltage was applied to a trench shaped target immersed in a high density Ar plasma (1010 cm-3). The time evolution of sheath length obtained by the simulations for a flat plane part of the surface agreed with the analytical result obtained by the Child-Langmuir method. In a bipolar pulse PIII&D system, a positive and a negative pulse voltages are applied alternately to a workpiece without any other external plasma source. Simulation has been conducted for a target immersed in a very low density Ar plasma (107 cm-3) to compare the plasma generated by a negative and a positive pulse voltage applied to the target. When a negative pulse voltage is applied to the target, only a weak plasma is generated. In contrast to it, when a positive pulse voltage is applied, a two-order or more high density plasma is generated under the same condition. The plasma behavior around a trench shaped target is also presented.

  8. Multiple Ion Implantation Effects on Wear and Wet Ability of Polyethylene Based Polymers

    NASA Astrophysics Data System (ADS)

    Torrisi, L.; Visco, A. M.; Campo, N.

    2004-10-01

    Polyethylene based polymers were ion implanted with multiple irradiations of different ions (N+, Ar+ and Kr+) at energies between 30 keV and 300 keV and doses ranging between 1013 and 1016 ions/cm2. The ion implantation dehydrogenises the polyethylene inducing cross-link effects in the residual polymer carbons. At high doses the irradiated surface show properties similar to graphite surfaces. The depth of the modified layers depends on the ion range in polyethylene at the incident ion energy. The chemical modification depends on the implanted doses and on the specie of the incident ions. A "pin-on-disc" machine was employed to measure the polymer wear against AISI-316 L stainless steel. A "contact-angle-test" machine was employed to measure the wet ability of the polymer surface for 1 μl pure water drop. Measurements demonstrate that the multiple ion implantation treatments decrease the surface wear and the surface wetting and produce a more resistant polymer surface. The properties of the treated surfaces improves the polymer functionality for many bio-medical applications, such as those relative to the polyethylene friction discs employed in knee and hip prosthesis joints. The possibility to use multiply ion implantations of polymers with traditional ion implanters and with laser ion sources producing plasmas is investigated.

  9. Establishment of reproducible osteosarcoma rat model using orthotopic implantation technique.

    PubMed

    Yu, Zhe; Sun, Honghui; Fan, Qingyu; Long, Hua; Yang, Tongtao; Ma, Bao'an

    2009-05-01

    In experimental musculoskeletal oncology, there remains a need for animal models that can be used to assess the efficacy of new and innovative treatment methodologies for bone tumors. Rat plays a very important role in the bone field especially in the evaluation of metabolic bone diseases. The objective of this study was to develop a rat osteosarcoma model for evaluation of new surgical and molecular methods of treatment for extremity sarcoma. One hundred male SD rats weighing 125.45+/-8.19 g were divided into 5 groups and anesthetized intraperitoneally with 10% chloral hydrate. Orthotopic implantation models of rat osteosarcoma were performed by injecting directly into the SD rat femur with a needle for inoculation with SD tumor cells. In the first step of the experiment, 2x10(5) to 1x10(6) UMR106 cells in 50 microl were injected intraosseously into median or distal part of the femoral shaft and the tumor take rate was determined. The second stage consisted of determining tumor volume, correlating findings from ultrasound with findings from necropsia and determining time of survival. In the third stage, the orthotopically implanted tumors and lung nodules were resected entirely, sectioned, and then counter stained with hematoxylin and eosin for histopathologic evaluation. The tumor take rate was 100% for implants with 8x10(5) tumor cells or more, which was much less than the amount required for subcutaneous implantation, with a high lung metastasis rate of 93.0%. Ultrasound and necropsia findings matched closely (r=0.942; p<0.01), which demonstrated that Doppler ultrasonography is a convenient and reliable technique for measuring cancer at any stage. Tumor growth curve showed that orthotopically implanted tumors expanded vigorously with time-lapse, especially in the first 3 weeks. The median time of survival was 38 days and surgical mortality was 0%. The UMR106 cell line has strong carcinogenic capability and high lung metastasis frequency. The present rat

  10. Immediate Dental Implant Placements Using Osteotome Technique: A Case Report and Literature Review.

    PubMed

    Al-Almaie, Saad

    2016-01-01

    This clinical case describes the effect of the osteotome technique on the osseointegration of a mandibular dental implant in a 42-year-old female patient with dento-alveolar bony defects and to review the literature regarding immediate implant placement using osteotome technique. The amount of bone expansion at the alveolar ridge and the marginal bone resorption from the time of implant placement to one year after the implant's functional loading were recorded clinically. The esthetic outcome for the restored implant (the gingival margin) was achieved one years after the implant's functional loading. The surgical and prosthetic sites for the implant showed no postoperative complications, and no infection or wound dehiscence was recorded during the follow-up period. The osteotome technique is good for the purpose for which it was introduced, and its advantages with immediate implant placement include reduced surgical trauma and a shorter treatment time. PMID:27583046

  11. Does the Implant Surgical Technique Affect the Primary and/or Secondary Stability of Dental Implants? A Systematic Review

    PubMed Central

    Shadid, Rola Muhammed; Sadaqah, Nasrin Rushdi; Othman, Sahar Abdo

    2014-01-01

    Background. A number of surgical techniques for implant site preparation have been advocated to enhance the implant of primary and secondary stability. However, there is insufficient scientific evidence to support the association between the surgical technique and implant stability. Purpose. This review aimed to investigate the influence of different surgical techniques including the undersized drilling, the osteotome, the piezosurgery, the flapless procedure, and the bone stimulation by low-level laser therapy on the primary and/or secondary stability of dental implants. Materials and methods. A search of PubMed, Cochrane Library, and grey literature was performed. The inclusion criteria comprised observational clinical studies and randomized controlled trials (RCTs) conducted in patients who received dental implants for rehabilitation, studies that evaluated the association between the surgical technique and the implant primary and/or secondary stability. The articles selected were carefully read and classified as low, moderate, and high methodological quality and data of interest were tabulated. Results. Eight clinical studies were included then they were classified as moderate or high methodological quality and control of bias. Conclusions. There is a weak evidence suggesting that any of previously mentioned surgical techniques could influence the primary and/or secondary implant stability. PMID:25126094

  12. A one-dimensional collisional model for plasma-immersion ion implantation

    SciTech Connect

    Vahedi, V.; Lieberman, M.A.; Alves, M.V.; Verboncoeur, J.P.; Birdsall, C.K. )

    1991-02-15

    Plasma-immersion ion implantation (also known as plasma-source ion implantation) is a process in which a target is immersed in a plasma and a series of large negative-voltage pulses are applied to it to extract ions from the plasma and implant them into the target. A general one-dimensional model is developed to study this process in different coordinate systems for the case in which the pressure of the neutral gas is large enough that the ion motion in the sheath can be assumed to be highly collisional.

  13. Ion implantation of erbium into polycrystalline cadmium telluride

    SciTech Connect

    Ushakov, V. V. Klevkov, Yu. V.; Dravin, V. A.

    2015-05-15

    The specific features of the ion implantation of polycrystalline cadmium telluride with grains 20–1000 μm in dimensions are studied. The choice of erbium is motivated by the possibility of using rare-earth elements as luminescent “probes” in studies of the defect and impurity composition of materials and modification of the composition by various technological treatments. From the microphotoluminescence data, it is found that, with decreasing crystal-grain dimensions, the degree of radiation stability of the material is increased. Microphotoluminescence topography of the samples shows the efficiency of the rare-earth probe in detecting regions with higher impurity and defect concentrations, including regions of intergrain boundaries.

  14. Structure and micro-mechanical properties of helium-implanted layer on Ti by plasma-based ion implantation

    NASA Astrophysics Data System (ADS)

    Ma, Xinxin; Li, Jinlong; Sun, Mingren

    2008-08-01

    The present paper concentrates on structure and micro-mechanical properties of the helium-implanted layer on titanium treated by plasma-based ion implantation with a pulsed voltage of -30 kV and doses of 3, 6, 9 and 12 × 10 17 ions/cm 2, respectively. X-ray photoelectron spectroscopy and transmission electron microscopy are employed to characterize the structure of the implanted layer. The hardnesses at different depths of the layer were measured by nano-indentation. We found that helium ion implantation into titanium leads to the formation of bubbles with a diameter from a few to more than 10 nm and the bubble size increases with the increase of dose. The primary existing form of Ti is amorphous in the implanted layer. Helium implantation also enhances the ingress of O, C and N and stimulates the formations of TiO 2, Ti 2O 3, TiO, TiC and TiN in the near surface layer. And the amount of the ingressed oxygen is obviously higher than those of nitrogen and carbon due to its higher activity. At the near surface layer, the hardnesses of all implanted samples increases remarkably comparing with untreated one and the maximum hardness has an increase by a factor of up to 3.7. For the samples implanted with higher doses of 6, 9 and 12 × 10 17 He/cm 2, the local displacement bursts are clearly found in the load-displacement curves. For the samples implanted with a lower dose of 3 × 10 17 He/cm 2, there is no obvious displacement burst found. Furthermore, the burst width increases with the increase of the dose.

  15. Open questions in electronic sputtering of solids by slow highly charged ions with respect to applications in single ion implantation

    SciTech Connect

    Schenkel, T.; Rangelow, I.W.; Keller, R.; Park, S.J.; Nilsson, J.; Persaud, A.; Radmilivitc, V.R.; Liddle, J.A.; Grabiec, P.; Bokor, J.; Schneider, D.H.

    2003-07-16

    In this article we discuss open questions in electronic sputtering of solids by slow, highly charged ions in the context of their application in a single ion implantation scheme. High yields of secondary electrons emitted when highly charged dopant ions impinge on silicon wafers allow for formation of non-Poissonian implant structures such as single atom arrays. Control of high spatial resolution and implant alignment require the use of nanometer scale apertures. We discuss electronic sputtering issues on mask lifetimes, and damage to silicon wafers.

  16. A simple ion implanter for material modifications in agriculture and gemmology

    NASA Astrophysics Data System (ADS)

    Singkarat, S.; Wijaikhum, A.; Suwannakachorn, D.; Tippawan, U.; Intarasiri, S.; Bootkul, D.; Phanchaisri, B.; Techarung, J.; Rhodes, M. W.; Suwankosum, R.; Rattanarin, S.; Yu, L. D.

    2015-12-01

    In our efforts in developing ion beam technology for novel applications in biology and gemmology, an economic simple compact ion implanter especially for the purpose was constructed. The designing of the machine was aimed at providing our users with a simple, economic, user friendly, convenient and easily operateable ion implanter for ion implantation of biological living materials and gemstones for biotechnological applications and modification of gemstones, which would eventually contribute to the national agriculture, biomedicine and gem-industry developments. The machine was in a vertical setup so that the samples could be placed horizontally and even without fixing; in a non-mass-analyzing ion implanter style using mixed molecular and atomic nitrogen (N) ions so that material modifications could be more effective; equipped with a focusing/defocusing lens and an X-Y beam scanner so that a broad beam could be possible; and also equipped with a relatively small target chamber so that living biological samples could survive from the vacuum period during ion implantation. To save equipment materials and costs, most of the components of the machine were taken from decommissioned ion beam facilities. The maximum accelerating voltage of the accelerator was 100 kV, ideally necessary for crop mutation induction and gem modification by ion beams from our experience. N-ion implantation of local rice seeds and cut gemstones was carried out. Various phenotype changes of grown rice from the ion-implanted seeds and improvements in gemmological quality of the ion-bombarded gemstones were observed. The success in development of such a low-cost and simple-structured ion implanter provides developing countries with a model of utilizing our limited resources to develop novel accelerator-based technologies and applications.

  17. Swelling or erosion on the surface of patterned GaN damaged by heavy ion implantation

    SciTech Connect

    Gao, Yuan; Lan, Chune; Xue, Jianming; Yan, Sha; Wang, Yugang; Xu, Fujun; Shen, Bo; Zhang, Yanwen

    2010-06-08

    Wurtzite undoped GaN epilayers (0 0 0 1) was implanted with 500 keV Au+ ions at room temperature under different doses, respectively. Ion implantation was performed through photoresist masks on GaN to produce alternating strips. The experimental results showed that the step height of swelling and decomposition in implanted GaN depended on ion dose and annealing temperature, i.e., damage level and its evolution. This damage evolution is contributed to implantation-induced defect production, and defect migration/accumulation occurred at different levels of displacement per atom. The results suggest that the swelling is due to the formation of porous structures in the amorphous region of implanted GaN. The decomposition of implanted area can be attributed to the disorder saturation and the diffusion of surface amorphous layer.

  18. Effects of ion implantation on the photoferroelectric properties of lead lanthanum zirconate titanate ceramics

    SciTech Connect

    Land, C.E.; Peercy, P.S.

    1981-01-01

    Earlier studies of Ar-, Ar + Ne- and Ar + Ne + He- implanted ferroelectric-phase lead lanthanum zirconate titanate (PLZT) ceramics indicate that ion implantation can increase the intrinsic (near-uv) photoferroelectric sensitivity by more than four orders of magnitude compared to that of unimplanted PLZT. More recent studies involving implantation of chemically active ions, e.g., Al and Cr, indicate that the absorption spectrum of the implanted region can be extended from the near-uv to the visible, and that the extrinsic (visible-light) photoferroelectric sensitivity can be improved substantially with respect to that of PLZT implanted with inert ions. The results of these studies are reviewed and photographic sensitivities of Ar-, Ar + Ne-, Ar + Ne + He-, Al-, Cr-, Fe-, and Fe + Ne- implanted PLZT at both near-uv and visible-light wavelengths are compared with the sensitivities of other image storage media.

  19. High Curie temperature drive layer materials for ion-implanted magnetic bubble devices

    NASA Technical Reports Server (NTRS)

    Fratello, V. J.; Wolfe, R.; Blank, S. L.; Nelson, T. J.

    1984-01-01

    Ion implantation of bubble garnets can lower the Curie temperature by 70 C or more, thus limiting high temperature operation of devices with ion-implanted propagation patterns. Therefore, double-layer materials were made with a conventional 2-micron bubble storage layer capped by an ion-implantable drive layer of high Curie temperature, high magnetostriction material. Contiguous disk test patterns were implanted with varying doses of a typical triple implant. Quality of propagation was judged by quasistatic tests on 8-micron period major and minor loops. Variations of magnetization, uniaxial anisotropy, implant dose, and magnetostriction were investigated to ensure optimum flux matching, good charged wall coupling, and wide operating margins. The most successful drive layer compositions were in the systems (SmDyLuCa)3(FeSi)5O12 and (BiGdTmCa)3(FeSi)5O12 and had Curie temperatures 25-44 C higher than the storage layers.

  20. N and Cr ion implantation of natural ruby surfaces and their characterization

    NASA Astrophysics Data System (ADS)

    Rao, K. Sudheendra; Sahoo, Rakesh K.; Dash, Tapan; Magudapathy, P.; Panigrahi, B. K.; Nayak, B. B.; Mishra, B. K.

    2016-04-01

    Energetic ions of N and Cr were used to implant the surfaces of natural rubies (low aesthetic quality). Surface colours of the specimens were found to change after ion implantation. The samples without and with ion implantation were characterized by diffuse reflectance spectra in ultra violet and visible region (DRS-UV-Vis), field emission scanning electron microscopy (FESEM), selected area electron diffraction (SAED) and nano-indentation. While the Cr-ion implantation produced deep red surface colour (pigeon eye red) in polished raw sample (without heat treatment), the N-ion implantation produced a mixed tone of dark blue, greenish blue and violet surface colour in the heat treated sample. In the case of heat treated sample at 3 × 1017 N-ions/cm2 fluence, formation of colour centres (F+, F2, F2+ and F22+) by ion implantation process is attributed to explain the development of the modified surface colours. Certain degree of surface amorphization was observed to be associated with the above N-ion implantation.

  1. Spectral Ellipsometry and Electron Backscatter Diffraction Analyses of Silicon Surfaces Implanted with Silver Ions

    NASA Astrophysics Data System (ADS)

    Bazarov, V. V.; Nuzhdin, V. I.; Valeev, V. F.; Vorobev, V. V.; Osin, Yu. N.; Stepanov, A. L.

    2016-03-01

    Amorphous silicon (a-Si) produced on surfaces of single-crystal substrates (c-Si) by low-energy low-dose implantation of silver ions is studied by spectral ellipsometry and electron backscatter diffraction. Implantation was done with an ion energy of 30 keV at a constant ion beam current density of 2 μA/cm2 and doses of 6.24·1012-1.25·1016 ions/cm2 on room temperature substrate targets. Irradiation was carried out with a current density of 0.1-5 μA/cm2 for implantation doses of 6.24·1013 and 1.87·1014 ions/cm2. It was found that spectral ellipsometry is an accurate andreliable method for monitoring low-dose ion implantation processes.

  2. Study on the Growth and the Photosynthetic Characteristics of Low Energy C+ Ion Implantation on Peanut

    PubMed Central

    Han, Yuguo; Xu, Lei; Yang, Peiling; Ren, Shumei

    2013-01-01

    Employing the Nonghua 5 peanut as experimental material, the effects of low energy C+ ion implantation on caulis height, root length, dry weight, photosynthetic characteristics and leaf water use efficiency (WUE) of Peanut Ml Generation were studied. Four fluences were observed in the experiment. The results showed that ion implantation harmed the peanut seeds because caulis height, root length and dry weight all were lower in the treatments than in CK, and the harm was aggravated with the increase of ion fluence. Both Pn and Tr show a saddle-shape curve due to midday depression of photosynthesis. Low fluence of low energy C+ ion implantation could increase the diurnal average Pn of peanut. The diurnal variation of Tr did not change as significantly as Pn. The light saturation point (LSP) was restrained by the ions. After low energy C+ ion implantation, WUE was enhanced. When the fluence increased to a certain level, the WUE began to decrease. PMID:23861939

  3. Depth profiles of MeV heavy ions implanted into Si and lithium triborate

    NASA Astrophysics Data System (ADS)

    Wang, Ke-Ming; Shi, Bo-Rong; Cue, Nelson; Shen, Ding-Yu; Chen, Feng; Wang, Xue-Lin; Lu, Fei

    2004-10-01

    MeV Cu + and Ni + ions were implanted into Si crystal and lithium triborate. The depth profiles of implanted Cu + and Ni + ions into Si and lithium triborate were measured by secondary ion mass spectrometry (SIMS). Mean projected range and range straggling extracted are compared with calculated values based on different versions of transport of ions in matter: TRIM'90, TRIM'98 and SRIM 2003. The results show that TRIM'90 has predicted well the experimental data of mean projected range and range straggling for MeV Cu + ions implanted into Si, the maximum differences between measured and calculated values are within 4%, but for the case of 2.0 MeV Ni + ions implanted into lithium triborate, the experimental value is significantly different from the calculated one based on TRIM'90.

  4. Ion-implanted PLZT ceramics: a new high-sensitivity image storage medium

    SciTech Connect

    Peercy, P.S.; Land, C.E.

    1980-01-01

    Results were presented of our studies of photoferroelectric (PFE) image storage in H- and He-ion implanted PLZT (lead lanthanum zirconate titanate) ceramics which demonstrate that the photosensitivity of PLZT can be significantly increased by ion implantation in the ceramic surface to be exposed to image light. More recently, implantations of Ar and Ar + Ne into the PLZT surface have produced much greater photosensitivity enhancement. For example, the photosensitivity after implantation with 1.5 x 10/sup 14/ 350 keV Ar/cm/sup 2/ + 1 x 10/sup 15/ 500 keV Ne/cm/sup 2/ is increased by about four orders of magnitude over that of unimplanted PLZT. Measurements indicate that the photosensitivity enhancement in ion-implanted PLZT is controlled by implantation-produced disorder which results in marked decreases in dielectric constant and dark conductivity and changes in photoconductivity of the implanted layer. The effects of Ar- and Ar + Ne-implantation are presented along with a phenomenological model which describes the enhancement in photosensitivity obtained by ion implantation. This model takes into account both light- and implantation-induced changes in conductivity and gives quantitative agreement with the measured changes in the coercive voltage V/sub c/ as a function of near-uv light intensity for both unimplanted and implanted PLZT. The model, used in conjunction with calculations of the profiles of implantation-produced disorder, has provided the information needed for co-implanting ions of different masses, e.g., Ar and Ne, to improve photosensitivity.

  5. High current vacuum-arc ion source for ion implantation and coating deposition technologies

    SciTech Connect

    Ryabchikov, Alexander I.; Ryabchikov, Igor A.; Stepanov, Igor B.; Dektyarev, Sergey V.

    2006-03-15

    This work is devoted to the development and investigation of a high current ion source based on dc vacuum-arc plasma generation. Extraction and acceleration of ion beams are realized in a repetitively pulsed mode with the pulse repetition rate up to 200 pps, the pulse duration up to 400 {mu}s, the accelerating voltage up to 40 kV, and the pulsed ion-beam current up to 2 A. To remove microparticles from the vacuum-arc plasma a straight-line plasma filter is used. Examples of the source use for realization of high-intensity and high-concentration ion implantation regimes including those with formation of doped layers at depths that exceed ion projective range for more than an order of magnitude are presented. At the expense of change in order and intensity of ion and plasma material treatment, the advantage of application of one source for execution of material surface pretreatment and activation regimes, formation of wide transition layers between the substrate and coating, coating deposition, and high-intensity ion mixing using ions of the same type was shown.

  6. Construction of waveguiding structures in potassium lithium tantalate niobate crystals by combined laser ablation and ion implantation

    NASA Astrophysics Data System (ADS)

    Yashar, Ayelet Badichi; Ilan, Harel; Agranat, Aharon J.

    2015-02-01

    A generic methodology for constructing complex integrated electro-optic circuits in waveguided configurations is presented. The method is based on combining two techniques, "laser ablation" and "refractive index engineering by ion implantations." The constructed circuits are side-cladded by air trenches that were produced using laser ablation and bottom-cladded by a layer with a reduced refractive index which is generated through the implantation of He+ ions. This fabrication technique enables the construction of circular structures with complex geometry featuring small radii of curvature, and further can be employed to construct microfluidic channels on the same substrate. The research demonstrates waveguides in both linear and circular configurations that were constructed in a potassium lithium tantalate niobate (KLTN) substrate using the aforementioned method, proving that this substrate is a suitable candidate for use in creating laboratories-on-a-chip with multifunctional capabilities. The proposed techniques used in the research are generic and applicable to a wide range of substrates.

  7. Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology.

    PubMed

    Kang, Byung-Soo; Sul, Young-Taeg; Jeong, Yongsoo; Byon, Eungsun; Kim, Jong-Kuk; Cho, Suyeon; Oh, Se-Jung; Albrektsson, Tomas

    2011-07-01

    The present study investigated the effect of metal plasma immersion ion implantation and deposition (MePIIID) process parameters, i.e., plasma sources of magnesium and calcium, ion dose, and acceleration voltage on the surface chemistry and morphology of screw-type titanium implants that have been most widely used for osseointegrated implants. It is found that irrespective of plasma ion source, surface topography and roughness showed no differences at the nanometer level; that atom concentrations increased with ion dose but decreased with acceleration voltage. Data obtained from X-ray photoelectron spectroscopy and auger electron spectroscopy suggested that MePIIID process produces 'intermixed' layer of cathodic arc deposition and plasma immersion ion implantation. The MePIIID process may create desired bioactive surface chemistry of dental and orthopaedic implants by tailoring ion and plasma sources and thus enable investigations of the effect of the surface chemistry on bone response. PMID:21334957

  8. Flexible system for multiple plasma immersion ion implantation-deposition processes

    NASA Astrophysics Data System (ADS)

    Tian, Xiubo; Fu, Ricky K. Y.; Chu, Paul K.; Anders, Andre; Gong, Chunzhi; Yang, Shiqin

    2003-12-01

    Multiple plasma immersion ion implantation-deposition offers better flexibility compared to other thin film deposition techniques with regard to process optimization. The plasmas may be based on either cathodic arc plasmas (metal ions) or gas plasmas (gas ions) or both of them. Processing parameters such as pulsing frequency, pulse duration, bias voltage amplitude, and so on, that critically affect the film structure, internal stress, surface morphology, and other surface properties can be adjusted relatively easily to optimize the process. The plasma density can be readily controlled via the input power to obtain the desirable gas-to-metal ion ratios in the films. The high-voltage pulses can be applied to the samples within (in-duration mode), before (before-duration mode), or after (after-duration mode) the firing of the cathodic arcs. Consequently, dynamic ion beam assisted deposition processes incorporating various mixes of gas and metal ions can be achieved to yield thin films with the desirable properties. The immersion configuration provides to a certain degree the ability to treat components that are large and possess irregular geometries without resorting to complex sample manipulation or beam scanning. In this article we describe the hardware functions of such a system, voltage-current behavior to satisfy the needs of different processes, as well as typical experimental results.

  9. Effect of splinting in accuracy of two implant impression techniques.

    PubMed

    de Avila, Erica Dorigatti; de Matos Moraes, Fernanda; Castanharo, Sabrina Maria; Del'Acqua, Marcelo Antonialli; de Assis Mollo, Francisco

    2014-12-01

    Because there is no consensus in the literature about the need for a splint between copings, the aim of this study was to evaluate, in vitro, the accuracy of 2 impression techniques for implant-supported prostheses. A master cast was fabricated with four parallel implant abutment analogs and a passive framework. Two groups with 5 casts each were formed: Group 1 (squared impression copings with no splint: S) and Group 2 (splinted squared impression copings, using metal drill burs and Pattern resin: SS). The impression material used was polyvinyl siloxane with open trays for standard preparation of the casts. For each cast, the framework was positioned, and a titanium screw was tightened with 10 N·cm torque in analog A, after which measurements of the abutment-framework interface gaps were performed at analogs C and D. This process was repeated for analog D. These measurements were analyzed using software. A one-way analysis of variance (ANOVA) with a confidence interval of 95% was used to analyze the data. Significant differences were detected between S and SS in relation to the master cast (P ≤ 0.05). The median values of the abutment-framework interface gaps were as follows: master cast: 39.64 μm; squared impression copings with no splint: 205.86 μm; splinted squared impression copings: 99.19 μm. Under the limitations of this study, the technique presented for Group 2 produces better results compared with the technique used for Group 1. PMID:25506658

  10. Swift and heavy ion implanted chalcogenide laser glass waveguides and their different refractive index distributions

    SciTech Connect

    Qiu Feng; Narusawa, Tadashi; Zheng Jie

    2011-02-10

    Planar waveguides have been fabricated in Nd- or Ho-doped gallium lanthanum sulfide laser glasses by 60 MeV Ar or 20 MeV N ion implantation. The refractive index profiles were reconstructed based on the results of prism coupling. The Ar implanted waveguides exhibit an approximate steplike distribution, while the N implanted ones show a ''well + barrier'' type. This difference can be attributed to the much lower dose of Ar ions. After annealing, the N implanted waveguides can support two modes at 1539 nm and have low propagation loss, which makes them candidates for novel waveguide lasers.

  11. Luminescence and structural properties of defects in ion implanted ZnO

    NASA Astrophysics Data System (ADS)

    Monteiro, T.; Soares, M. J.; Neves, A. J.; Carmo, M. C.; Peres, M.; Cruz, A.; Alves, E.; Wahl, U.; Rita, E.; Munoz-Sanjose, V.; Zuniga-Perez, J.

    2006-03-01

    ZnO substrates and films were intentionally implanted with rare earth and transition metal ions. The influence of the implantation and subsequent air thermal annealing treatments on the structural and optical properties of ZnO samples were studied by using Rutherford backscattering spectrometry and low temperature photoluminescence techniques. Intraionic Tm-related emission was observed for bulk and ZnO films. Similarly, Eu and Tb-doped ZnO films follow the same trend observed in bulk samples. No intraionic related emission was observed for Eu-doped samples even being the ion in Zn sites and for the Tb-doped samples ion segregation was observed for thermal annealing temperatures above 800 °C. For the Mn-doped ZnO bulk samples the lattice recovery follows the same trend to that one observed for the Fe-doped samples, starting near 800 °C being fully recovered at 1050 °C. Although Fe3+ was observed no intraionic Mn-related emission was detected under the used conditions.

  12. Electronic and vibrational spectra of InP quantum dots formed by sequential ion implantation

    SciTech Connect

    Mu, R.; Henderson, D.O.; Tung, Y.S.; Ueda, A.; Hall, C.; Collins, W.E.; White, C.W.; Zuhr, R.A.; Zhu, J.G.

    1996-05-01

    Sequential ion implantation of indium and phosphorus into silica combined with controlled thermal annealing has proven to be a novel and effective technique to fabricate InP quantum dots in dielectric hosts. This technique has been applied to synthesize other III{endash}V and II{endash}VI quantum dots. Due to the unique bimodal distribution of the indium in a silica host and a stoichiometric mismatch between the indium and phosphorus concentration profiles, it is believed that two different-sized InP quantum dots were fabricated. More importantly, we have shown that the infrared reflectance technique is a very effective method to identify the species in the dielectric host and is also a powerful tool to investigate surface phonon modes. {copyright} {ital 1996 American Vacuum Society}

  13. MAGNESIUM PRECIPITATION AND DIFUSSION IN Mg+ ION IMPLANTED SILICON CARBIDE

    SciTech Connect

    Jiang, Weilin; Jung, Hee Joon; Kovarik, Libor; Wang, Zhaoying; Roosendaal, Timothy J.; Zhu, Zihua; Edwards, Danny J.; Hu, Shenyang Y.; Henager, Charles H.; Kurtz, Richard J.; Wang, Yongqiang

    2015-03-02

    As a candidate material for fusion reactor applications, silicon carbide (SiC) undergoes transmutation reactions under high-energy neutron irradiation with magnesium as the major metallic transmutant; the others include aluminum, beryllium and phosphorus in addition to helium and hydrogen gaseous species. Calculations by Sawan et al. predict that at a dose of ~100 dpa (displacements per atom), there is ~0.5 at.% Mg generated in SiC. The impact of these transmutants on SiC structural stability is currently unknown. This study uses ion implantation to introduce Mg into SiC. Multiaxial ion-channeling analysis of the as-produced damage state indicates a lower dechanneling yield observed along the <100> axis. The microstructure of the annealed sample was examined using high-resolution scanning transmission electron microscopy. The results show a high concentration of likely non-faulted tetrahedral voids and possible stacking fault tetrahedra near the damage peak. In addition to lattice distortion, dislocations and intrinsic and extrinsic stacking faults are also observed. Magnesium in 3C–SiC prefers to substitute for Si and it forms precipitates of cubic Mg2Si and tetragonal MgC2. The diffusion coefficient of Mg in 3C–SiC single crystal at 1573 K has been determined to be 3.8 ± 0.4E-19 m2/s.

  14. Magnetic properties and recording performances of patterned media fabricated by nitrogen ion implantation

    NASA Astrophysics Data System (ADS)

    Hinoue, Tatsuya; Ito, Kenichi; Hirayama, Yoshiyuki; Ono, Toshinori; Inaba, Hiroshi

    2011-04-01

    Nitrogen ion implantation was performed on CoCrPt-SiO2 perpendicular media with a resist mask to fabricate patterned media. Signal amplitude and autocorrelation signal-to-noise ratio of the preamble pattern were measured to evaluate the quality of the pattern fabricated by the ion implantation. The signal-to-noise ratio and the jitter were closely related to the saturation magnetization of the ion-implanted area. The remained magnetization of the ion-implanted area probably affects edge roughness of the magnetic pattern. Larger reduction of the saturation magnetization at the ion-implanted area is important for obtaining higher signal quality. Off-track profiles and 747 curves were measured for 76-nm-pitch discrete track fabricated by ion implantation. The results show that discrete track recording had advantages over recording on continuous magnetic film, which indicates that the fabricated patterns were successfully isolated. The nitrogen ion implantation was effective in fabricating isolated magnetic tracks or isolated magnetic dots for the patterned media.

  15. Versatile permanent planar implant technique utilizing Iodine-125 seeds imbedded in gelfoam

    SciTech Connect

    Marchese, M.J.; Nori, D.; Anderson, L.L.; Hilaris, B.S.

    1984-05-01

    Tumors attached or adjacent to critical structures can often not be completely resected or resected with adequate surgical margins. Sites involving major blood vessels, the vertebral column or the brain with small residual tumors or suspicious margins often present technical difficulties for standard I-125 or Ir-192 implants. A relatively simple, accurate and inexpensive implant method is decribed using I-125 seeds imbedded in gelfoam to implant permanently into small residual tumors or suspicious margins where standard implant techniques may be unsatisfactory. A method for planning the treatment dose for such an implant is described. Cases involving paraspinal and brain tumors are reported to illustrate the technique.

  16. Surface modification of poly(propylene carbonate) by oxygen ion implantation

    NASA Astrophysics Data System (ADS)

    Zhang, Jizhong; Kang, Jiachen; Hu, Ping; Meng, Qingli

    2007-04-01

    Poly(propylene carbonate) (PPC) was implanted by oxygen ion with energy of 40 keV. The influence of experimental parameters was investigated by varying ion fluence from 1 × 10 12 to 1 × 10 15 ions/cm 2. XPS, SEM, surface roughness, wettability, hardness, and modulus were employed to investigate structure and properties of the as-implanted PPC samples. Eight chemical groups, i.e., carbon, C sbnd H, C sbnd O sbnd C, C sbnd O, O sbnd C sbnd O, C dbnd O, ?, and ? groups were observed on surfaces of the as-implanted samples. The species and relative intensities of the chemical groups changed with increasing ion fluence. SEM images displayed that irradiation damage was related strongly with ion fluence. Both surface-recovering and shrunken behavior were observed on surface of the PPC sample implanted with fluence of 1 × 10 15 ions/cm 2. As increasing ion fluence, the surface roughness of the as-implanted PPC samples increased firstly, reached the maximum value of 159 nm, and finally decreased down the minimum value. The water droplet contact angle of the as-implanted PPC samples changed gradually with fluence, and reached the minimum value of 70° with fluence of 1 × 10 15 ions/cm 2. The hardness and modulus of the as-implanted PPC samples increased with increasing ion fluence, and reached their corresponding maximum values with fluence of 1 × 10 15 ions/cm 2. The experimental results revealed that oxygen ion fluence closely affected surface chemical group, morphology, surface roughness, wettability, and mechanical properties of the as-implanted PPC samples.

  17. Ion implantation of ceramic bearings. Final report, 1 September 1988-1 March 1989

    SciTech Connect

    Armini, A.J.; Bunker, S.N.

    1989-06-01

    This report explores the use of ion-implantation techniques to form solid lubricating surfaces on all ceramic (silicon nitride) and hybrid ball bearings. Techniques were developed to implant and/or coat silicon nitride and 52100 bearing steel with MoS{sub 2}, boron, and tin ion beams. A friction/wear tester was also developed to evaluate these coatings in both air and dry nitrogen atmospheres. Friction test results have yielded durable films on both silicon nitride and 52100 steel that exhibit friction coefficients less than 0.1 in a dry state. Oil-lubricated controls in a hybrid bearing also show 0.1. Other dry film processes developed have exhibited ultra-low friction (0.02 to 0.05), but these films had limited lifetime. The dry films are fairly durable and adherent but more work is needed to further improve the durability and adapt the coating process to coating complicated shapes such as balls and rings. (JES)

  18. Ion Implantation of Perfluoropolyether-Lubricated Surfaces for Improved Tribological Performance

    NASA Technical Reports Server (NTRS)

    Shogrin, Brad

    1998-01-01

    For over 30 years, perfluoropolyethers (PFPE's) have been the liquid lubricants of choice for space applications because of their proven tribological performance and desirable properties, such as low vapor pressure and a wide liquid temperature range. These oils are used in such space mechanisms as gyroscopes, scanning mirrors, actuators, and filter wheels. In the past few years, there have been several incidents during which PFPE-lubricated space mechanisms have shown anomalous behavior. These anomalies are thought to be the result of PFPE degradation. Investigative research focused on understanding and modeling the degradation of PFPE lubricants has shown that PFPE's degrade and lose their desirable properties while under boundary-lubricated, sliding/rolling contacts and at elevated temperatures. These performance deficiencies are strongly dependent on the surface chemistry and reactivity of the lubricated contacts, which dictate the formation of harmful catalytic by-products. One way to inhibit tribo-induced degradation may be to use passivated surfaces that do not promote the formation of harmful by-products. Such a passivated surface would inhibit PFPE degradation and increase the lifetime of the lubricated mechanism. Ion implantation is one such passivation technique. This surface-treatment technique can modify the surface properties of materials without affecting either the properties or dimensions of the bulk material beneath the treated layer. By introducing a foreign species into a submicron surface layer, ion implantation can induce unique surface microstructures.

  19. Comparison of Dimensional Accuracy between Open-Tray and Closed-Tray Implant Impression Technique in 15° Angled Implants

    PubMed Central

    Balouch, F; Jalalian, E; Nikkheslat, M; Ghavamian, R; Toopchi, Sh; Jallalian, F; Jalalian, S

    2013-01-01

    Statement of Problem: Various impression techniques have different effects on the accuracy of final cast dimensions. Meanwhile; there are some controversies about the best technique. Purpose: This study was performed to compare two kinds of implant impression methods (open tray and closed tray) on 15 degree angled implants. Materials and Method: In this experimental study, a steel model with 8 cm in diameter and 3 cm in height were produced with 3 holes devised inside to stabilize 3 implants. The central implant was straight and the other two implants were 15° angled. The two angled implants had 5 cm distance from each other and 3.5 cm from the central implant. Dental stone, high strength (type IV) was used for the main casts. Impression trays were filled with poly ether, and then the two impression techniques (open tray and closed tray) were compared. To evaluate positions of the implants, each cast was analyzed by CMM device in 3 dimensions (x,y,z). Differences in the measurements obtained from final casts and laboratory model were analyzed using t-Test. Results: The obtained results indicated that closed tray impression technique was significantly different in dimensional accuracy when compared with open tray method. Dimensional changes were 129 ± 37μ and 143.5 ± 43.67μ in closed tray and open tray, while coefficient of variation in closed- tray and open tray were reported to be 27.2% and 30.4%, respectively. Conclusion: Closed impression technique had less dimensional changes in comparison with open tray method, so this study suggests that closed tray impression technique is more accurate. PMID:24724130

  20. The electrical properties of 60 keV zinc ions implanted into semi-insulating gallium arsenide

    NASA Technical Reports Server (NTRS)

    Littlejohn, M. A.; Anikara, R.

    1972-01-01

    The electrical behavior of zinc ions implanted into chromium-doped semiinsulating gallium arsenide was investigated by measurements of the sheet resistivity and Hall effect. Room temperature implantations were performed using fluence values from 10 to the 12th to 10 to the 15th power/sq cm at 60 keV. The samples were annealed for 30 minutes in a nitrogen atmosphere up to 800 C in steps of 200 C and the effect of this annealing on the Hall effect and sheet resistivity was studied at room temperature using the Van der Pauw technique. The temperature dependence of sheet resistivity and mobility was measured from liquid nitrogen temperature to room temperature. Finally, a measurement of the implanted profile was obtained using a layer removal technique combined with the Hall effect and sheet resistivity measurements.

  1. Effects of fluoride-ion-implanted titanium surface on the cytocompatibility in vitro and osseointegatation in vivo for dental implant applications.

    PubMed

    Wang, Xue-jin; Liu, Hui-ying; Ren, Xiang; Sun, Hui-yan; Zhu, Li-ying; Ying, Xiao-xia; Hu, Shu-hai; Qiu, Ze-wen; Wang, Lang-ping; Wang, Xiao-feng; Ma, Guo-wu

    2015-12-01

    As an attractive technique for the improvement of biomaterials, Plasma immersion ion implantation (PIII) has been applied to modifying the titanium material for dental implant application. The present study investigated the cytocompatibility and early osseointegration of fluoride-ion-implanted titanium (F-Ti) surface and implants, both characterizing in their composition of titanium oxide and titanium fluoride. The cytocompatibility of F-Ti was evaluated in vitro by using scanning electron microscope, Cell Counting Kit-8 assay, alkaline phosphatase activity assay, and quantitative real-time polymerase chain reaction. The results showed that the F-Ti weakened the effects that Porphyromonas gingivalis exerted on the MG-63 cells in terms of morphology, proliferation, differentiation, and genetic expression when MG-63 cells and Porphyromonas gingivalis were co-cultured on the surface of F-Ti. Meanwhile, the osteogenic activity of F-Ti implants was assessed in vivo via evaluating the histological morphology and estimating histomorphometric parameters. The analysis of toluidine blue staining indicated that the new bone was more mature in subjects with F-Ti group, which exhibited the Haversian system, and the mean bone-implant contact value of F-Ti group was slightly higher than that of cp-Ti group (p>0.05). Fluorescence bands were wider and brighter in the F-Ti group, and the intensity of fluorochromes deposited at the sites of mineralized bone formation was significantly higher for F-Ti surfaces than for cp-Ti surfaces, within the 2nd, 3rd and 4th weeks (p<0.05). An indication is that the fluoride modified titanium can promote cytocompatibility and early osseointegration, thus providing a promising alternative for clinical use. PMID:26519937

  2. Effect of dual ion implantation of calcium and phosphorus on the properties of titanium.

    PubMed

    Krupa, D; Baszkiewicz, J; Kozubowski, J A; Barcz, A; Sobczak, J W; Biliński, A; Lewandowska-Szumieł, M; Rajchel, B

    2005-06-01

    This study is concerned with the effect of dual implantation of calcium and phosphorus upon the structure, corrosion resistance and biocompatibility of titanium. The ions were implanted in sequence, first Ca and then P, both at a dose of 10(17) ions/cm2 at a beam energy of 25 keV. Transmission electron microscopy was used to investigate the microstructure of the implanted layer. The chemical composition of the implanted layer was examined by XPS and SIMS. The corrosion resistance was determined by electrochemical methods in a simulated body fluid (SBF) at a temperature of 37 degrees C. The biocompatibility tests were performed in vitro in a culture of human-derived bone cells (HDBC) in contact with the tested materials. The viability of the cells was determined by an XTT assay and their activity by the measurements of the alkaline phosphatase activity in contact with implanted and non-implanted titanium samples. The in vitro examinations confirmed that, under the conditions prevailing during the experiments, the biocompatibility of Ca + P ion-implanted titanium was satisfactory. TEM results show that the surface layer formed by the Ca + P implantation is amorphous. The corrosion resistance of titanium, examined by the electrochemical methods, appeared to be increased after the Ca + P ion implantation. PMID:15603780

  3. Alternative technique for calcium phosphate coating on titanium alloy implants

    PubMed Central

    Le, Van Quang; Pourroy, Geneviève; Cochis, Andrea; Rimondini, Lia; Abdel-Fattah, Wafa I; Mohammed, Hadeer I; Carradò, Adele

    2014-01-01

    As an alternative technique for calcium phosphate coating on titanium alloys, we propose to functionalize the metal surface with anionic bath containing chlorides of palladium or silver as activators. This new deposition route has several advantages such as controlled conditions, applicability to complex shapes, no adverse effect of heating, and cost effectiveness. A mixture of hydroxyapatite and calcium phosphate hydrate is deposited on the surface of Ti–6Al–4V. Calcium phosphate coating is built faster compared with the one by Simulated Body Fluid. Cell morphology and density are comparable to the control one; and the results prove no toxic compound is released into the medium during the previous seven days of immersion. Moreover, the cell viability is comparable with cells cultivated with the virgin medium. These experimental treatments allowed producing cytocompatible materials potentially applicable to manufacture implantable devices for orthopedic and oral surgeries. PMID:24646569

  4. Formation of carbon nanoclusters by implantation of keV carbon ions in fused silica followed by thermal annealing

    NASA Astrophysics Data System (ADS)

    Olivero, P.; Peng, J. L.; Liu, A.; Reichart, P.; McCallum, J. C.; Sze, J. Y.; Lau, S. P.; Tay, B. K.; Kalish, R.; Dhar, S.; Feldman, Leonard; Jamieson, David N.; Prawer, Steven

    2005-02-01

    In the last decade, the synthesis and characterization of nanometer sized carbon clusters have attracted growing interest within the scientific community. This is due to both scientific interest in the process of diamond nucleation and growth, and to the promising technological applications in nanoelectronics and quantum communications and computing. Our research group has demonstrated that MeV carbon ion implantation in fused silica followed by thermal annealing in the presence of hydrogen leads to the formation of nanocrystalline diamond, with cluster size ranging from 5 to 40 nm. In the present paper, we report the synthesis of carbon nanoclusters by the implantation into fused silica of keV carbon ions using the Plasma Immersion Ion Implantation (PIII) technique, followed by thermal annealing in forming gas (4% 2H in Ar). The present study is aimed at evaluating this implantation technique that has the advantage of allowing high fluence-rates on large substrates. The carbon nanostructures have been characterized with optical absorption and Raman spectroscopies, cross sectional Transmission Electron Microscopy (TEM), and Parallel Electron Energy Loss Spectroscopy (PEELS). Nuclear Reaction Analysis (NRA) has been employed to evaluate the deuterium incorporation during the annealing process, as a key mechanism to stabilize the formation of the clusters.

  5. Shallow nitrogen ion implantation: Evolution of chemical state and defect structure in titanium

    NASA Astrophysics Data System (ADS)

    Manojkumar, P. A.; Chirayath, V. A.; Balamurugan, A. K.; Krishna, Nanda Gopala; Ilango, S.; Kamruddin, M.; Amarendra, G.; Tyagi, A. K.; Raj, Baldev

    2016-09-01

    Evolution of chemical states and defect structure in titanium during low energy nitrogen ion implantation by Plasma Immersion Ion Implantation (PIII) process is studied. The underlying process of chemical state evolution is investigated using secondary ion mass spectrometry and X-ray photoelectron spectroscopy. The implantation induced defect structure evolution as a function of dose is elucidated using variable energy positron annihilation Doppler broadening spectroscopy (PAS) and the results were corroborated with chemical state. Formation of 3 layers of defect state was modeled to fit PAS results.

  6. Optical characteristics of Cu-nanocluster layers assembled by ion implantation

    SciTech Connect

    Haglund, R.F. Jr.; Yang, L. . Dept. of Physics and Astronomy); Magruder, R.H. III; Wittig, J.E. . Dept. of Materials Science and Engineering); Zuhr, R.A. )

    1991-01-01

    We have generated cluster layers in solid insulating substrates by implanting Cu ions into fused silica, creating thin layers ({approximately} 150 nm) of nonoclusters over a diameter of order 2 cm. Transmission electron microscopy shows that the size and size distribution can be controlled by the parameters of the ion implantation. We report measurements of the optical properties and nonlinear index of the refraction on these unusual solid-phase cluster materials as a function of total implanted-ion dose. 7 refs., 8 figs.

  7. Shape memory effect and superelasticity of titanium nickelide alloys implanted with high ion doses

    NASA Astrophysics Data System (ADS)

    Pogrebnjak, A. D.; Bratushka, S. N.; Beresnev, V. M.; Levintant-Zayonts, N.

    2013-12-01

    The state of the art in ion implantation of superelastic NiTi shape memory alloys is analyzed. Various technological applications of the shape memory effect are outlined. The principles and techiques of ion implantation are described. Specific features of its application for modification of surface layers in surface engineering are considered. Key properties of shape memory alloys and problems in utilization of ion implantation to improve the surface properties of shape memory alloys, such as corrosion resistance, friction coefficient, wear resistance, etc. are discussed. The bibliography includes 162 references.

  8. Helium ion implantation in zirconium: Bubble formation and growth

    NASA Astrophysics Data System (ADS)

    Totemeier, Aaron Robert

    To evaluate the behavior of inert helium gas bubbles in zirconium three variants of the metal were implanted with 140 keV helium ions to a total fluence of 3x1017 cm--2 and characterized in cross-section TEM in their as-implanted state as well as during annealing at different temperatures. The three zirconium alloys included high-purity crystal bar material, Zircaloy-4, and a powder-metallurgically extruded material with high carbon and oxygen concentrations. At a sample depth consistent with a helium concentration of approximately 5 atomic percent, a change in the structure of the zirconium was observed a high density region of small (4nm diameter) bubbles formed at concentrations above 10 atom percent. Initial bubble formation and growth was observed to occurred at a temperature between 400-450 °C and these initial bubbles had a unique planar geometry prior to migration and coalescence into more three-dimensional bubbles. These planar bubbles appear to be aligned with major axes parallel to the TEM specimen surface and their formation and growth is possibly due to an increase in the thermal vacancy flux within the zirconium. The observations of bubble response to high temperature annealing suggest that in zirconium, as in other metals, maximum bubble size is weakly dependent on annealing time, whereas the bubble size distribution is strongly dependent on time. Specimens that underwent a prolonged room temperature aging developed a multimodal bubble size distribution within the high density region of small bubbles, concentrated near the highest helium concentration depth.

  9. Magnetization control for bit pattern formation of spinel ferromagnetic oxides by Kr ion implantation

    NASA Astrophysics Data System (ADS)

    Kita, Eiji; Suzuki, Kazuya Z.; Liu, Yang; Utsumi, Yuji; Morishita, Jumpei; Oshima, Daiki; Kato, Takeshi; Niizeki, Tomohiko; Mibu, Ko; Yanagihara, Hideto

    2014-05-01

    As a first step toward the development of bit-patterned magnetic media made of oxides, we investigated the effectiveness of magnetism control by Kr implantation in a typical spinel ferromagnetic oxide, Fe3O4. We implanted Kr ions accelerated at 30 kV on 13-nm-thick Fe3O4 thin films at dosages of (1-40) × 1014 ions/cm2. Magnetization decreased with increase in ion dosages and disappeared when irradiation was greater than 2 × 1015 ions/cm2 of Kr ions. These dosages are more than ten times smaller than that used in the N2 implantation for metallic and oxide ferromagnets. Both the temperature dependence of magnetization and the Mössbauer study suggest that the transition of Fe3O4 from ferromagnetic to paramagnetic took place sharply due to Kr ion irradiation, which produces two-phase separation—ferromagnetic and nonmagnetic with insufficient dosage of Kr ions.

  10. Frictional coefficients of ion-implanted alumina against ion-implanted beta-titanium in the low load, low velocity, single pass regime.

    PubMed

    Kusy, R P; Tobin, E J; Whitley, J Q; Sioshansi, P

    1992-05-01

    The frictional coefficients were measured for four wire alloys against the flats of polycrystalline alumina cylinders using a low load, low velocity, single pass device. Ion-implantations of titanium into polycrystalline alumina flats and nitrogen into beta-titanium wires reduced the static and kinetic coefficients from 0.50 and 0.44 before implantation to 0.20 and 0.25 after implantation, respectively. These results are similar in magnitude to frictional coefficients for unimplanted, control couples of stainless steel, cobalt-chromium, and nickel titanium wires against polycrystalline alumina flats. For orthodontic applications, we conclude that more efficient and reproducible appliances can be engineered for tooth movement if ion-implantation is used to reduce the abrasion of beta-titanium by polycrystalline alumina. PMID:1521704

  11. Blistering and cracking of LiTaO3 single crystal under helium ion implantation

    NASA Astrophysics Data System (ADS)

    Ma, Changdong; Lu, Fei; Ma, Yujie

    2015-03-01

    Blistering and cracking in LiTaO3 surface are investigated after 200-keV helium ion implantation and subsequent post-implantation annealing. Rutherford backscattering/channeling is used to examine the lattice damage caused by ion implantation. Blistering is observed through optical microscopy in a dynamic heating process. Atomic force microscopy and scanning electron microscopy measurements are used to detect the LiTaO3 surface morphology. Experimental results show that blistering and flaking are dependent on implantation fluence, beam current, and also annealing temperature. We speculate that the surface cracking of He+-implanted LiTaO3 results from the implantation-induced stress and compression.

  12. Ion implantation to reduce wear on polyethylene prosthetic devices. Rept. for Aug 89-Jan 91

    SciTech Connect

    Not Available

    1991-05-01

    Researchers studied the use of ion implantation to improve the wear performance of ultra high molecular weight polyethylene (UHMWPE). UHMWPE samples were implanted with high energy ions, tested for wear performance, and compared to unimplanted control samples. Surface friction and hardness measurements, Raman scattering, Rutherford backscattering (RBS), water contact angle, and film transfer tests were performed to characterize the surface property changes of implanted UHMWPE samples. Results indicated a 90% reduction in wear on implanted UHMWPE disks. Implantation increased surface microhardness and surface energy. The Raman spectrum revealed a diamond-like signature, indicting carbon bonds of a different nature than those found in unimplanted polyehtylene. Photographic analysis of pins used in wear testing revealed differences between implanted and unimplanted samples in the polyethylene film transferred in the initial stages of wear from the disk to the pin.

  13. Microstructure of Co-doped TiO₂ (110) Rutile by Ion Implantation

    SciTech Connect

    Wang, Chong M.; Shutthanandan, V.; Thevuthasan, Suntharampillai; Droubay, Timothy C.; Chambers, Scott A.

    2005-04-01

    Co-doped rutile TiO₂ was synthesized by injecting Co ions into single crystal rutile TiO₂ using high energy ion implantation. Microstructures of the implanted specimens were studied in detail using high-resolution transmission electron microscopy (HRTEM), energy dispersive x-ray spectroscopy (EDS), electron diffraction, and HRTEM image simulations. The spatial distribution and conglomeration behavior of the implanted Co ions, as well as the point defect distributions induced by ion implantation, show strong dependences on implantation conditions. Uniform distribution of Co ions in the rutile TiO₂ lattice was obtained by implanting at 1075 K with a Co ion fluence of 1.25x10¹⁶ Co/cm². Implanting at 875 K leads to the formation of Co metal clusters. The precipitated Co metal clusters and surrounding TiO₂ matrix exhibit the orientation relationships Co<110>//TiO₂[001] and Co{111}//TiO₂(110). A structural model representing the interface between Co metal clusters and TiO₂ is developed based on HRTEM imaging and image simulations.

  14. Microstructure of Co-doped TiO{sub 2}(110) rutile by ion implantation

    SciTech Connect

    Wang, C.M.; Shutthanandan, V.; Thevuthasan, S.; Droubay, T.; Chambers, S.A.

    2005-04-01

    Co-doped rutile TiO{sub 2} was synthesized by injecting Co ions into single crystal rutile TiO{sub 2} using high energy ion implantation. Microstructures of the implanted specimens were studied in detail using high-resolution transmission electron microscopy (HRTEM), energy dispersive x-ray spectroscopy, electron diffraction, and HRTEM image simulations. The spatial distribution and conglomeration behavior of the implanted Co ions, as well as the point defect distributions induced by ion implantation, show strong dependences on implantation conditions. Uniform distribution of Co ions in the rutile TiO{sub 2} lattice was obtained by implanting at 1075 K with a Co ion fluence of 1.25x10{sup 16} Co/cm{sup 2}. Implanting at 875 K leads to the formation of Co metal clusters. The precipitated Co metal clusters and surrounding TiO{sub 2} matrix exhibit the orientation relationships Co<110> parallel TiO{sub 2}[001] and Co{l_brace}111{r_brace} parallel TiO{sub 2}(110). A structural model representing the interface between Co metal clusters and TiO{sub 2} is developed based on HRTEM imaging and image simulations.

  15. Characterization of Surface Properties and Microstructure of PVD-TiN Films Using Mevva Ion Implantation

    NASA Astrophysics Data System (ADS)

    Yang, J. H.; Cheng, M. F.; Luo, X. D.; Zhang, T. H.

    The PVD-TiN film was implanted with titanium ions and the improvement in surface wear resistance was investigated. Ti ion implantation was done using a metal vapor vacuum arc (MEVVA) ion source with an implantation dose of 2 × 1016 ions/cm2 and at an extraction voltage of 48 kV. The wear characteristics of the implanted zone was measured and compared to the performance of the unimplanted zone by a pin-on-disc apparatus and an optical interference microscope. The structure of the implanted zone and unimplanted one was observed by X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). A dynamic TRIM called TRIDYN was used to calculate the concentration depth profile of implanted Ti in TiN to investigate the profile of multi-charge state ions. The results showed that the improved wear resistance of the TiN film was mainly due to the presence of nano-order TiN crystal grains after Ti ion implantation.

  16. Simultaneous depth-profiling of electrical and elemental properties of ion-implanted arsenic in silicon by combining secondary-ion mass spectrometry with resistivity measurements

    NASA Astrophysics Data System (ADS)

    Bennett, N. S.; Wong, C. S.; McNally, P. J.

    2016-07-01

    A method is proposed to extract the electrical data for surface doping profiles of semiconductors in unison with the chemical profile acquired by secondary-ion mass spectrometry (SIMS)—a method we call SIMSAR (secondary-ion mass spectrometry and resistivity). The SIMSAR approach utilizes the inherent sputtering process of SIMS, combined with sequential four-point van der Pauw resistivity measurements, to surmise the active doping profile as a function of depth. The technique is demonstrated for the case of ion-implanted arsenic doping profiles in silicon. Complications of the method are identified, explained, and corrections for these are given. While several techniques already exist for chemical dopant profiling and numerous for electrical profiling, since there is no technique which can measure both electrical and chemical profiles in parallel, SIMSAR has significant promise as an extension of the conventional dynamic SIMS technique, particularly for applications in the semiconductor industry.

  17. The Void Effect of Mevva W Ion Implantation on the Tribological Properties of H13 Steel

    NASA Astrophysics Data System (ADS)

    Yang, Jianhua; Zhang, Tonghe

    H13 steel samples were implanted with tungsten using a metal vapor vacuum arc (MEVVA) ion source, with an implantation dose of 1×1017 cm-2, an extraction acceleration of 30 kV and pulsed ion beam fluxes of between 0.3 mA·cm-2 and 6 mA·cm-2. The surface mechanical properties and microstructure for the W-implanted samples was characterized by the Rutherford backscattering spectroscope (RBS) and a high voltage electron microscope (HVEM). Experimental results of wear and hardness indicated that the hardness and wear of H13 steel increased when the voids were produced by tungsten ion implantation with a high pulsed current density. Forming causes for voids and their influence on the tungsten concentration depth profile in the implanted H13 steel and the surface mechanical properties were discussed in terms of spike theory.

  18. Ion implantation processing for high-speed GaAs JFETs

    SciTech Connect

    Zolper, J.C.; Baca, A.G.; Sherwin, M.E.; Shul, R.J.

    1995-07-01

    GaAs Junction Field Effect Transistors (JFETs) offer a higher gate turn-on voltage, resulting in a better noise margin and reduced power dissipation, than the more widely employed GaAs MESFET. The primary reason the JFET has not been more widely used is the speed penalty associated with the gate/channel junction and corresponding gate length broadening. We present the ion implantation processes used for a self-aligned, all ion-implanted, GaAs JFET that minimizes the speed penalty for the JFET while maintaining the advantageous higher gate turn-on voltage. Process characterization of the p{sub +}-gate implant done with either Mg, Zn, or Cd along with the co-implantation of P is presented. In addition, a novel backside channel confinement technology employing ion-implanted carbon is discussed. Complete JFET device results are reported.

  19. Surface, electrical and mechanical modifications of PMMA after implantation with laser produced iron plasma ions

    NASA Astrophysics Data System (ADS)

    Ahmed, Qazi Salman; Bashir, Shazia; Jalil, Sohail Abdul; Shabbir, Muhammad Kaif; Mahmood, Khaliq; Akram, Mahreen; Khalid, Ayesha; Yaseen, Nazish; Arshad, Atiqa

    2016-07-01

    Laser Produced Plasma (LPP) was employed as an ion source for the modifications in surface, electrical and mechanical properties of poly methyl (methacrylate) PMMA. For this purpose Nd:YAG laser (532 nm, 6 ns, 10 Hz) at a fluence of 12.7 J/cm2 was employed to generate Fe plasma. The fluence and energy measurements of laser produced Fe plasma ions were carried out by employing Thomson Parabola Technique in the presence of magnetic field strength of 0.5 T, using CR-39 as Solid State Nuclear Track Detector (SSNTD). It has been observed that ion fluence ejecting from ablated plasma was maximum at an angle of 5° with respect to the normal to the Fe target surface. PMMA substrates were irradiated with Fe ions of constant energy of 0.85 MeV at various ion fluences ranging from 3.8 × 106 ions/cm2 to 1.8 × 108 ions/cm2 controlled by varying laser pulses from 3000 to 7000. Optical microscope and Scanning Electron Microscope (SEM) were utilized for the analysis of surface features of irradiated PMMA. Results depicted the formation of chain scission, crosslinking, dendrites and star like structures. To explore the electrical behavior, four probe method was employed. The electrical conductivity of ion irradiated PMMA was increased with increasing ion fluence. The surface hardness was measured by shore D hardness tester and results showed the monotonous increment in surface hardness with increasing ion fluence. The increasing trend of surface hardness and electrical conductivity with increasing Fe ion fluence has been well correlated with the surface morphology of ion implanted PMMA. The temperature rise of PMMA surface due to Fe ion irradiation is evaluated analytically and comes out to be in the range of 1.72 × 104 to 1.82 × 104 K. The values of total Linear Energy Transfer (LET) or stopping power of 0.8 MeV Fe ions in PMMA is 61.8 eV/Å and their range is 1.34 μm evaluated by SRIM simulation.

  20. Spin-dependent recombination at arsenic donors in ion-implanted silicon

    SciTech Connect

    Franke, David P. Brandt, Martin S.; Otsuka, Manabu; Matsuoka, Takashi; Itoh, Kohei M.; Vlasenko, Leonid S.; Vlasenko, Marina P.

    2014-09-15

    Spin-dependent transport processes in thin near-surface doping regions created by low energy ion implantation of arsenic in silicon are detected by two methods, spin-dependent recombination using microwave photoconductivity and electrically detected magnetic resonance monitoring the direct current through the sample. The high sensitivity of these techniques allows the observation of the magnetic resonance, in particular, of As in weak magnetic fields and at low resonance frequencies (40–1200 MHz), where high-field-forbidden transitions between the magnetic sublevels can be observed due to the mixing of electron and nuclear spin states. Several implantation-induced defects are present in the samples studied and act as spin readout partner. We explicitly demonstrate this by electrically detected electron double resonance experiments and identify a pair recombination of close pairs formed by As donors and oxygen-vacancy centers in an excited triplet state (SL1) as the dominant spin-dependent process in As-implanted Czochralski-grown Si.

  1. Integration of a particle monitor into the control system for an ion implanter

    NASA Astrophysics Data System (ADS)

    Myers, Steven; McCarron, David; Blake, Julian

    1993-04-01

    The value of in situ particle monitors for both manufacturing process control and process development in the semiconductor industry is receiving considerable recognition. This paper discusses the integration of a high yield technology (HYT) sensor into the control system of an Baton high current ion implanter. The automatic triggering of the particle monitor during the various phases of the implant process and the autoclean cycle provides a definite representation of the machine state and the effect of processing over time. Utilizing existing features of the control system, specific thresholds can be associated with each implant process through its process recipe. By regular monitoring of the particle counter, these thresholds are used to anticipate the need for cleaning the process chamber, or if indicated, gracefully bring the current process to an immediate halt. A dedicated history log preserves detailed data for generating summary statistics and the complete data set of a particular process or overall machine performance. Future uses of this tool with the control system point toward statistical process control applications and intelligent self modifying process cycles. The presentation will include data from a system on which an HYT sensor was employed as a full time process monitor using modified SPC techniques for analysis.

  2. Heavy-ion sources: The Star, or the Cinderella, of the ion-implantation firmament? (invited)

    NASA Astrophysics Data System (ADS)

    Freeman, Harry

    2000-02-01

    The Star, because of the invaluable contribution which the heavy-ion source has already made to the successful development of semiconductor implantation. And the Star, too, because it is evident that the key characteristics of such sources, which are now used on a quite routine industrial basis—their reliability, their ease of operation and, above all, their extraordinary versatility—have still not been fully exploited. This ensures that there is still scope, at least in the short term, for further optimization, which will go some way to meet the increasingly stringent industrial doping requirements. The Cinderella, because of my belief that these heavy-ion sources have now contributed to the successful operation of ion implanters so well, and for so long, that their present level of performance is mistakenly taken for granted. The result has been a paucity of meaningful research and development. Despite this, in this article I aim to show that, like Cinderella, who was so neglected that her true merit was long overlooked, there is the prospect too of achieving the significantly larger improvements in beam quality which the semiconductor industry will eventually be seeking.

  3. Vacancy-related defects in n-type Si implanted with a rarefied microbeam of accelerated heavy ions in the MeV range

    NASA Astrophysics Data System (ADS)

    Capan, I.; Pastuović, Ž.; Siegele, R.; Jaćimović, R.

    2016-04-01

    Deep level transient spectroscopy (DLTS) has been used to study vacancy-related defects formed in bulk n-type Czochralski-grown silicon after implantation of accelerated heavy ions: 6.5 MeV O, 10.5 MeV Si, 10.5 MeV Ge, and 11 MeV Er in the single ion regime with fluences from 109 cm-2 to 1010 cm-2 and a direct comparison made with defects formed in the same material irradiated with 0.7 MeV fast neutron fluences up to 1012 cm-2. A scanning ion microprobe was used as the ion implantation tool of n-Cz:Si samples prepared as Schottky diodes, while the ion beam induced current (IBIC) technique was utilized for direct ion counting. The single acceptor state of the divacancy V2(-/0) is the most prominent defect state observed in DLTS spectra of n-CZ:Si samples implanted by selected ions and the sample irradiated by neutrons. The complete suppression of the DLTS signal related to the double acceptor state of divacancy, V2(=/-) has been observed in all samples irradiated by ions and neutrons. Moreover, the DLTS peak associated with formation of the vacancy-oxygen complex VO in the neutron irradiated sample was also completely suppressed in DLTS spectra of samples implanted with the raster scanned ion microbeam. The reason for such behaviour is twofold, (i) the local depletion of the carrier concentration in the highly disordered regions, and (ii) the effect of the microprobe-assisted single ion implantation. The activation energy for electron emission for states assigned to the V2(-/0) defect formed in samples implanted by single ions follows the Meyer-Neldel rule. An increase of the activation energy is strongly correlated with increasing ion mass.

  4. Ion Implantation Angle Variation to Device Performance and the Control in Production

    SciTech Connect

    Zhao, Z.Y.; Hendrix, D.; Wu, L.Y.; Cusson, B.K.

    2003-08-26

    As the device features get smaller and aspect ratios of photoresist openings get steeper, shadowing effect has more impact on the performance of devices. Many of the traditional 7 deg. tilt implants have progressed to 0 deg. implants. But shadowing may still occur if the tilt angle deviates from normal direction. Some implants, such as halo implants, demand even more stringent angle control to reduce device performance variation. The demand for implant angle control and monitoring thus becomes more obvious and important. However, statistical process control (SPC) cannot be done on shadowing effect without special test structures. Channeling, on the other hand, provides good sensitivity in regard to implant angle changes. It is the authors' intention to introduce channeling implant in different channels to monitor the implant angle variation. The incoming <100> silicon wafers have a cut-angle spec of +/- 1.0 deg. This poses a difficulty if one wants to control the implant angle's accuracy within +/- 0.5 deg. Other measures have to be taken to ensure the consistency of test wafers and to have prompt diagnosis feedback when needed. This paper will discuss the effect of implant tilt angle on device parameters and how to control the angle variation in production. Correlations of implant tilt angle variation to ThermaWave, sheet resistance (Rs), Secondary Ion Mass Spectrometry (SIMS) and device parameters will be covered with certain implant conditions.

  5. Ion Implantation Angle Variation to Device Performance and the Control in Production

    NASA Astrophysics Data System (ADS)

    Zhao, Z. Y.; Hendrix, D.; Wu, L. Y.; Cusson, B. K.

    2003-08-01

    As the device features get smaller and aspect ratios of photoresist openings get steeper, shadowing effect has more impact on the performance of devices. Many of the traditional 7° tilt implants have progressed to 0° implants. But shadowing may still occur if the tilt angle deviates from normal direction. Some implants, such as halo implants, demand even more stringent angle control to reduce device performance variation. The demand for implant angle control and monitoring thus becomes more obvious and important. However, statistical process control (SPC) cannot be done on shadowing effect without special test structures. Channeling, on the other hand, provides good sensitivity in regard to implant angle changes. It is the authors' intention to introduce channeling implant in different channels to monitor the implant angle variation. The incoming <100> silicon wafers have a cut-angle spec of +/- 1.0°. This poses a difficulty if one wants to control the implant angle's accuracy within +/- 0.5°. Other measures have to be taken to ensure the consistency of test wafers and to have prompt diagnosis feedback when needed. This paper will discuss the effect of implant tilt angle on device parameters and how to control the angle variation in production. Correlations of implant tilt angle variation to ThermaWave™, sheet resistance (Rs), Secondary Ion Mass Spectrometry (SIMS) and device parameters will be covered with certain implant conditions.

  6. Mechanisms of Focused Ion Beam Implantation Damage and Recovery in Si

    NASA Astrophysics Data System (ADS)

    Balasubramanian, G. P. S.; Hull, R.

    2016-06-01

    The ion current density in focused ion beam (FIB) systems, 0.1-10 A cm-2, is at least three orders of magnitude greater than that in commercial broad ion beam implanters. This large difference in ion current density is expected to strongly affect the damage recovery dynamics. In this work, we study the ion implantation damage and recovery of Si(100) substrates implanted with 1 × 1012-5 × 1015 Si cm-2 fluences of 60-keV Si2+ at normal incidence in a mass-selecting FIB. Additionally, damage and recovery in different broad ion beam implants of 60-keV Si+ were studied for a comparison. For recovering implantation damage, specimens were annealed for different times at 730-900°C in an ultra-high purity nitrogen ambient, and for characterizing damage and recovery, Raman spectroscopy at wavelengths 405 nm and 514 nm was carried out. Raman measurements comprised of measurements of crystalline Si (c-Si) peak height of the peak at 520 cm-1, and the peak shift relative to that of un-implanted reference Si. Our measurements of structural damage—calculated from the attenuation in the c-Si peak heights for the implants relative to that of unimplanted Si(100)—indicates that the FIB implantations lead to a greater as-implanted damage but also typically lead to a better recovery than that for the commercial broad-area implants. The underlying mechanisms for these observations are discussed.

  7. Techniques for Processing Eyes Implanted with a Retinal Prosthesis for Localized Histopathological Analysis: Part 2 Epiretinal Implants with Retinal Tacks

    PubMed Central

    Nayagam, David A.X.; Durmo, Irfan; McGowan, Ceara; Williams, Richard A.; Shepherd, Robert K.

    2015-01-01

    Retinal prostheses for the treatment of certain forms of blindness are gaining traction in clinical trials around the world with commercial devices currently entering the market. In order to evaluate the safety of these devices, in preclinical studies, reliable techniques are needed. However, the hard metal components utilised in some retinal implants are not compatible with traditional histological processes, particularly in consideration for the delicate nature of the surrounding tissue. Here we describe techniques for assessing the health of the eye directly adjacent to a retinal implant secured epiretinally with a metal tack. Retinal prostheses feature electrode arrays in contact with eye tissue. The most commonly used location for implantation is the epiretinal location (posterior chamber of the eye), where the implant is secured to the retina with a metal tack that penetrates all the layers of the eye. Previous methods have not been able to assess the proximal ocular tissue with the tack in situ, due to the inability of traditional histological techniques to cut metal objects. Consequently, it has been difficult to assess localized damage, if present, caused by tack insertion. Therefore, we developed a technique for visualizing the tissue around a retinal tack and implant. We have modified an established technique, used for processing and visualizing hard bony tissue around a cochlear implant, for the soft delicate tissues of the eye. We orientated and embedded the fixed eye tissue, including the implant and retinal tack, in epoxy resin, to stabilise and protect the structure of the sample. Embedded samples were then ground, polished, stained, and imaged under various magnifications at incremental depths through the sample. This technique allowed the reliable assessment of eye tissue integrity and cytoarchitecture adjacent to the metal tack. PMID:25798628

  8. X-Ray Rocking Curve and Ferromagnetic Resonance Investigations of Ion-Implanted Crystals

    NASA Astrophysics Data System (ADS)

    Speriosu, Virgil Simon

    A kinematical model for general Bragg case x-ray diffraction in nonuniform films is presented. The model incorporates depth-dependent strain and structure factor. Profiles of strain and structure factor are obtained by fitting experimental rocking curves. The method is applicable to ion-implanted, diffused and multilayer crystalline structures such as heterojunctions. A comparison is made between profiles of strain and incoherent atomic displacements obtained from rocking curves and Rutherford backscattering spectrometry in Ne('+) -implanted Gd(,3)Ga(,5)O(,12). The ranges of sensitivity of the two techniques overlap for about one decade in implantation dose up to the amorphous threshold. The two techniques are in excellent agreement on the near-surface strain, but differ significantly at depths below (TURNEQ)500A. The profiles of incoherently displaced atoms agree within a factor of two. The rocking curve method is combined with analysis of ferromagnetic resonance spectra for characterization of Gd,Tm,Ga:YIG films implanted with Ne('+), He('+), and H(,2)('+) over a wide range of doses. Profiles of normal strain, lateral strain and damage were obtained. Magnetic profiles were compared with the strain profiles. The local change in uniaxial anisotropy field (DELTA)H(,k) with increasing strain shows an initially linear rise for both He('+) and Ne('+), in agreement with the magnetostriction effect. For strain values greater than (TURNEQ)1.5%, (DELTA)H(,k) saturates and decreases to nearly zero when the material becomes paramagnetic. For H(,2)('+) implantation the total (DELTA)H(,k) consists of a magnetostrictive contribution due to strain and of a comparable excess contribution associated with the local concentration of hydrogen. With increasing annealing temperature the excess (DELTA)H(,k) diminishes and above 400(DEGREES)C the only component of (DELTA)H(,k) is magnetostrictive. For all three species the behavior of the saturation magnetization 4(pi)M, the exchange

  9. IonRock: software for solving strain gradients of ion-implanted semiconductors by X-ray diffraction measurements and evolutionary programming

    NASA Astrophysics Data System (ADS)

    Bleicher, Lucas; Sasaki, José Marcos; Orloski, Renata Villela; Cardoso, Lisandro Pavie; Hayashi, Marcelo Assaoka; Swart, Jacobus Willibrordus

    2004-07-01

    We present a program that uses an optimization algorithm to fit rocking curves of ion-implanted semiconductors. This is an inverse problem that cannot be solved by simple methods. However, using recursion formulae for rocking curve calculations and a model of ion distribution after implantation, it is possible to fit experimental data with a general-purpose optimization method. In our case, we use a modified version of the genetic algorithm, which has been shown to be a good technique for this problem. The program also calculates rocking curves for a given ion profile, such as those generated by ion implantation simulation programs. Program summaryTitle of program: IonRock, version 1.0 Catalogue identifier: ADTP Program summary URL:http://cpc.cs.qub.ac.uk/summaries/ADTP Program obtainable from: CPC Program Library, Queen's University of Belfast, N. Ireland Computer: any computer with Windows95 or later version Operating systems: Windows95/98/2000/NT/XP Programming language used: C++ Memory required to execute with typical data: about 4 MB No. of bytes in distributed program, including test data, etc.: 2 742 530 No of lines in distributed program, including test data etc.: 49 988 Distribution format: tar gzip file Nature of physical problem: strain determination on ion implanted zinc-blend structure semiconductors Method of solution: adapted version of the Genetic Algorithm meta-heuristic Restrictions on the complexity of the problem: strain determination is related to the strain generated by interstitial ions, which causes the left-side distortions on the rocking curve Typical running time: on an Athlon PC computer the computing time for solving the strain gradient using 16 layers takes from 10 to 30 minutes

  10. A technique to prevent dural adhesions to chronically implanted microelectrode arrays.

    PubMed

    Maynard, E M; Fernandez, E; Normann, R A

    2000-04-15

    Minimizing relative movements between neural tissues and arrays of microelectrodes chronically implanted into them is expected to greatly enhance the capacity of the microelectrodes to record from single cortical neurons on a long-term basis. We describe a new surgical technique to minimize the formation of adhesions between the dura and an implanted electrode array using a 12 microm (0.5 mil) thick sheet of Teflon film positioned between the array and the dura. A total of 15 cats were implanted using this technique. Gross examination of 12 implant sites at the time of sacrifice failed to find evidence of adhesions between the arrays and the dura when the Teflon(R) film remained in its initial position. In six implants from which recordings were made, an average of nine of the 11 (81%) connected electrodes in each array recorded evoked neural activity after 180 days post implantation. Further, on average, two separable units were identified on each of the implanted electrodes in these arrays. No significant change was found in the density of cell bodies around implanted electrodes of four of the implanted electrode arrays. However, histological evaluation of the implant sites revealed evidence of meningeal proliferation beneath the arrays. The technique described is shown to be effective at preventing adhesions between implanted electrode arrays and improve the characteristics of chronic recordings obtained with these structures. PMID:10788663

  11. Surface analytical studies of ion-implanted uni-directionally aligned silicon nitride for tribological applications

    NASA Astrophysics Data System (ADS)

    Nakamura, Naoki; Hirao, Kiyoshi; Yamauchi, Yukihiko

    2004-03-01

    Uni-directionally aligned silicon nitride, which exhibits both high strength and high toughness, was implanted with B +, N +, Si + and Ti + ions at a fluence of 2 × 10 17 ions/cm 2 and an energy of 200 keV. The effect of ion implantation on the surface structure of the uni-directionally aligned silicon nitride has been studied, in terms of surface analyses such as atomic force microscopy (AFM), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectroscopy (SIMS) and X-ray absorption near edge structure (XANES). It was clarified that the ion-implanted layer was amorphized and the implantation profile showed good agreement with that estimated from a TRIM simulation. It was found that BN and TiN were formed in B +- and Ti +-implanted Si 3N 4, respectively. There was a slight difference in ion implantation depth among different structures of Si 3N 4, considered to be due to differences in ion channeling.

  12. Adherent diamond like carbon coatings on metals via plasma source ion implantation

    SciTech Connect

    Walter, K.C.; Nastasi, M.; Munson, C.P.

    1996-12-01

    Various techniques are currently used to produce diamond-like carbon (DLC) coatings on various materials. Many of these techniques use metallic interlayers, such as Ti or Si, to improve the adhesion of a DLC coating to a ferrous substrate. An alternative processing route would be to use plasma source ion implantation (PSII) to create a carbon composition gradient in the surface of the ferrous material to serve as the interface for a DLC coating. The need for interlayer deposition is eliminated by using a such a graded interfaces PSII approach has been used to form adherent DLC coatings on magnesium, aluminum, silicon, titanium, chromium, brass, nickel, and tungsten. A PSII process tailored to create a graded interface allows deposition of adherent DLC coatings even on metals that exhibit a positive heat of formation with carbon, such as magnesium, iron, brass and nickel.

  13. Note: Laser ablation technique for electrically contacting a buried implant layer in single crystal diamond

    SciTech Connect

    Ray, M. P.; Baldwin, J. W.; Butler, J. E.; Pate, B. B.; Feygelson, T. I.

    2011-05-15

    The creation of thin, buried, and electrically conducting layers within an otherwise insulating diamond by annealed ion implantation damage is well known. Establishing facile electrical contact to the shallow buried layer has been an unmet challenge. We demonstrate a new method, based on laser micro-machining (laser ablation), to make reliable electrical contact to a buried implant layer in diamond. Comparison is made to focused ion beam milling.

  14. Effects of long pulse width and high pulsing frequency on surface superhydrophobicity of polytetrafluoroethylene in quasi-direct-current plasma immersion ion implantation

    SciTech Connect

    Kwok, Dixon T. K.; Wang Huaiyu; Yeung, Kelvin W. K.; Chu, Paul K.; Zhang Yumei

    2009-03-01

    Long pulse, high frequency quasi-direct-current (dc) oxygen plasma immersion ion implantation (PIII) is utilized to create a superhydrophobic polytetrafluoroethylene (PTFE) surface with a water contact angle of over 150 deg. This technique allows the use of a high duty cycle without deleterious effects such as extensive sample heating encountered in conventional PIII. Scanning electron microscopy images review submicrometer-nanometer structures on the PTFE surface after long pulse, high frequency PIII indicative of ion implantation. On the other hand, plasma modification is the dominant effect in short pulse, low frequency PIII. Quasi-dc PIII is demonstrated to offer adjustable synergistic plasma and ion beam effects.

  15. Ion implantation reduces radiation sensitivity of metal oxide silicon /MOS/ devices

    NASA Technical Reports Server (NTRS)

    1971-01-01

    Implanting nitrogen ions improves hardening of silicon oxides 30 percent to 60 percent against ionizing radiation effects. Process reduces sensitivity, but retains stability normally shown by interfaces between silicon and thermally grown oxides.

  16. Nissin Ion Doping System--H{sub 2}{sup +} Implantation for Silicon Layer Exfoliation

    SciTech Connect

    Cherekdjian, S.; Maschmeyer, R. O.; Cites, J.; Tatemichi, J.; Inouchi, Y.; Onoda, M.; Orihira, K.; Matsumoto, T.; Konishi, M.; Naito, M.

    2011-01-07

    A Nissin iG4 ion doping system (termed iG4) utilizes broad beam technology to implant GEN 4 sheets of glass for LCD production. The mechanical scanned end-station with robotic handling for GEN 4 glass substrates was redesigned, and a new end-station was built to handle rectangular silicon tiles (23x18 cm). A three sub-system modular risk reduction process was used to test production solutions, and maximize the success of transferring the R and D implant recipes developed on a standard focused beam ion implanter to the Nissin broad beam iG4 solution. The silicon tile end-station including the implant scanning system was tested for reliability and durability. The end-station handled rectangular silicon tiles reliably without detrimental edge chipping or silicon breakage. The ion optics was demonstrated to successfully provide stable hydrogen ions for the Corning registered silicon on glass layer transfer process. This layer transfer process is very susceptible and sensitive to the implant processing temperature. The temperature excursions during implant processing for the iG4 exfoliation process were found to be in line with the R and D focused ion beam system. This data confirmed the system production-readiness in providing an efficient solution for the high volume production of hydrogen implanted silicon rectangular tiles.

  17. Immobilization of extracellular matrix on polymeric materials by carbon-negative-ion implantation

    NASA Astrophysics Data System (ADS)

    Tsuji, Hiroshi; Sommani, Piyanuch; Muto, Takashi; Utagawa, Yoshiyuki; Sakai, Shun; Sato, Hiroko; Gotoh, Yasuhito; Ishikawa, Junzo

    2005-08-01

    Effects of ion implantation into polystyrene (PS), silicone rubber (SR) and poly-L-lactic acid (PLA) have been investigated for immobilization of extracellular matrix. Carbon negative ions were implanted into PS and SR sheets at various energies between 5-30 keV and various doses between 1.0 × 1014-1.0 × 1016 ions/cm2. Contact angles of pure water on C-implanted surfaces of PS and SR were decreased as increase in ion energy and in dose due to formation of functional groups such as OH and C-O. Selective attachment of nerve cells was observed on C-implanted them at 10 keV and 3 × 1015 ions/cm2 after in vitro cell culture of nerve cells of PC-12 h. Neurite outgrowth also extended over the implanted area. After dipping in a serum medium and in a fibronectin solution for 2 h, the detection of N 1s electrons by X-ray induced photoelectron spectroscopic (XPS) revealed a significant distinction of protein adhesion on the implanted area. Thus, immobilization of proteins on surface is used for considering the selective cell-attachment. For PLA, the selective attachment of cells and protein depended on the implantation conditions.

  18. Lithium Nitride Synthesized by in situ Lithium Deposition and Ion Implantation for Boron Neutron Capture Therapy

    NASA Astrophysics Data System (ADS)

    Ishitama, Shintaro; Baba, Yuji; Fujii, Ryo; Nakamura, Masaru; Imahori, Yoshio

    Li3N synthesis on Li deposition layer was conducted without H2O and O2 by in situ lithium deposition in high vacuum chamber of 10-6 Pa and ion implantation techniques and the thermo-chemical stability of the Li3N/Li/Cu tri-layered target for Boron Neutron Capture Therapy (BNCT) under laser heating and air exposure was characterized by X-ray photoelectron spectroscopy (XPS). Following conclusions were derived; (1) Li3N/Li/Cu tri-layered target with very low oxide and carbon contamination was synthesized by in situ lithium vacuum deposition and N2+ ion implantation without H2O and O2 additions, (2) The starting temperature of evaporation of Li3N/Li/Cu tri-layered target increased by 120K compared to that of the Li/Cu target and (3) Remarkable oxidation and carbon contamination were observed on the surface of Li3N/Li/Cu after air exposure and these contaminated compositions was not removed by Ar+ heavy sputtering.

  19. Direction-dependent RBS channelling studies in ion implanted LiNbO3

    NASA Astrophysics Data System (ADS)

    Wendler, E.; Becker, G.; Rensberg, J.; Schmidt, E.; Wolf, S.; Wesch, W.

    2016-07-01

    Damage formation in ion implanted LiNbO3 was studied by Rutherford backscattering spectrometry (RBS) along various directions of the LiNbO3 crystal. From the results obtained it can be unambiguously concluded that Nb atoms being displaced during ion implantation preferably occupy the free octahedron sites of the LiNbO3 lattice structure and most likely also form NbLi antisite defects.

  20. Neutron activation analysis for reference determination of the implantation dose of cobalt ions

    SciTech Connect

    Garten, R.P.H.; Bubert, H.; Palmetshofer, L.

    1992-05-15

    The authors prepared depth profilling reference materials by cobalt ion implantation at an ion energy of 300 keV into n-type silicon. The implanted Co dose was then determined by instrumental neutron activation analysis (INAA) giving an analytical dynamic range of almost 5 decades and uncertainty of 1.5%. This form of analysis allows sources of error (beam spreading, misalignment) to be corrected. 70 refs., 3 tabs.

  1. Evolution of Ion Implantation Technology and its Contribution to Semiconductor Industry

    SciTech Connect

    Tsukamoto, Katsuhiro; Kuroi, Takashi; Kawasaki, Yoji

    2011-01-07

    Industrial aspects of the evolution of ion implantation technology will be reviewed, and their impact on the semiconductor industry will be discussed. The main topics will be the technology's application to the most advanced, ultra scaled CMOS, and to power devices, as well as productivity improvements in implantation technology. Technological insights into future developments in ion-related technologies for emerging industries will also be presented.

  2. Immediate Dental Implant Placements Using Osteotome Technique: A Case Report and Literature Review

    PubMed Central

    Al-Almaie, Saad

    2016-01-01

    This clinical case describes the effect of the osteotome technique on the osseointegration of a mandibular dental implant in a 42-year-old female patient with dento-alveolar bony defects and to review the literature regarding immediate implant placement using osteotome technique. The amount of bone expansion at the alveolar ridge and the marginal bone resorption from the time of implant placement to one year after the implant’s functional loading were recorded clinically. The esthetic outcome for the restored implant (the gingival margin) was achieved one years after the implant’s functional loading. The surgical and prosthetic sites for the implant showed no postoperative complications, and no infection or wound dehiscence was recorded during the follow-up period. The osteotome technique is good for the purpose for which it was introduced, and its advantages with immediate implant placement include reduced surgical trauma and a shorter treatment time. PMID:27583046

  3. Photoluminescence and structural studies on extended defect evolution during high-temperature processing of ion-implanted epitaxial silicon

    NASA Astrophysics Data System (ADS)

    Giri, P. K.; Coffa, S.; Raineri, V.; Privitera, V.; Galvagno, G.; La Ferla, A.; Rimini, E.

    2001-04-01

    Low-temperature photoluminescence (PL) spectroscopy, in conjunction with transmission electron microscopy (TEM) and optical microscopy (OM) have been carried out to investigate the origin of radiative recombination from various extended defects that evolve during high-temperature processing of ion-implanted epitaxial silicon. From PL studies on N2-annealed samples, we provide spectroscopic evidence of precipitation of the implanted impurities well below the solid-solubility limit. This result is being supported by observations from secondary ion mass spectrometry and spreading resistance profiling of the implanted ions. Cross sectional TEM analyses on these samples reveal <111>-oriented precipitates located in a region containing a high dislocation density. Postimplantation annealing in oxygen ambient results in the formation of dislocations and oxidation-induced stacking faults (OISF). A systematic analysis of PL spectra on different-implanted and preannealed samples, in conjunction with TEM and OM analyses, reveals that the conventionally observed dislocation-related D1 and D2 lines in the PL spectrum is not a characteristic of the OISF, but of the dislocations only. It is shown that the OISF acts as a nonradiative channel for luminescence in silicon. Various other sources of nonradiative channels in silicon are also presented and the efficacy of photoluminescence technique in the characterization of process-induced defects in silicon is discussed.

  4. Tunnel oxide passivated contacts formed by ion implantation for applications in silicon solar cells

    NASA Astrophysics Data System (ADS)

    Reichel, Christian; Feldmann, Frank; Müller, Ralph; Reedy, Robert C.; Lee, Benjamin G.; Young, David L.; Stradins, Paul; Hermle, Martin; Glunz, Stefan W.

    2015-11-01

    Passivated contacts (poly-Si/SiOx/c-Si) doped by shallow ion implantation are an appealing technology for high efficiency silicon solar cells, especially for interdigitated back contact (IBC) solar cells where a masked ion implantation facilitates their fabrication. This paper presents a study on tunnel oxide passivated contacts formed by low-energy ion implantation into amorphous silicon (a-Si) layers and examines the influence of the ion species (P, B, or BF2), the ion implantation dose (5 × 1014 cm-2 to 1 × 1016 cm-2), and the subsequent high-temperature anneal (800 °C or 900 °C) on the passivation quality and junction characteristics using double-sided contacted silicon solar cells. Excellent passivation quality is achieved for n-type passivated contacts by P implantations into either intrinsic (undoped) or in-situ B-doped a-Si layers with implied open-circuit voltages (iVoc) of 725 and 720 mV, respectively. For p-type passivated contacts, BF2 implantations into intrinsic a-Si yield well passivated contacts and allow for iVoc of 690 mV, whereas implanted B gives poor passivation with iVoc of only 640 mV. While solar cells featuring in-situ B-doped selective hole contacts and selective electron contacts with P implanted into intrinsic a-Si layers achieved Voc of 690 mV and fill factor (FF) of 79.1%, selective hole contacts realized by BF2 implantation into intrinsic a-Si suffer from drastically reduced FF which is caused by a non-Ohmic Schottky contact. Finally, implanting P into in-situ B-doped a-Si layers for the purpose of overcompensation (counterdoping) allowed for solar cells with Voc of 680 mV and FF of 80.4%, providing a simplified and promising fabrication process for IBC solar cells featuring passivated contacts.

  5. Percutaneous Endovascular Salvage Techniques for Implanted Venous Access Device Dysfunction

    SciTech Connect

    Breault, Stéphane; Glauser, Frédéric; Babaker, Malik Doenz, Francesco Qanadli, Salah Dine

    2015-06-15

    PurposeImplanted venous access devices (IVADs) are often used in patients who require long-term intravenous drug administration. The most common causes of device dysfunction include occlusion by fibrin sheath and/or catheter adherence to the vessel wall. We present percutaneous endovascular salvage techniques to restore function in occluded catheters. The aim of this study was to evaluate the feasibility, safety, and efficacy of these techniques.Methods and MaterialsThrough a femoral or brachial venous access, a snare is used to remove fibrin sheath around the IVAD catheter tip. If device dysfunction is caused by catheter adherences to the vessel wall, a new “mechanical adhesiolysis” maneuver was performed. IVAD salvage procedures performed between 2005 and 2013 were analyzed. Data included clinical background, catheter tip position, success rate, recurrence, and rate of complication.ResultsEighty-eight salvage procedures were performed in 80 patients, mostly women (52.5 %), with a mean age of 54 years. Only a minority (17.5 %) of evaluated catheters were located at an optimal position (i.e., cavoatrial junction ±1 cm). Mechanical adhesiolysis or other additional maneuvers were used in 21 cases (24 %). Overall technical success rate was 93.2 %. Malposition and/or vessel wall adherences were the main cause of technical failure. No complications were noted.ConclusionThese IVAD salvage techniques are safe and efficient. When a catheter is adherent to the vessel wall, mechanical adhesiolysis maneuvers allow catheter mobilization and a greater success rate with no additional risk. In patients who still require long-term use of their IVAD, these procedures can be performed safely to avoid catheter replacement.

  6. Nonlinear damage effect in graphene synthesis by C-cluster ion implantation

    SciTech Connect

    Zhang Rui; Zhang Zaodi; Wang Zesong; Wang Shixu; Wang Wei; Fu Dejun; Liu Jiarui

    2012-07-02

    We present few-layer graphene synthesis by negative carbon cluster ion implantation with C{sub 1}, C{sub 2}, and C{sub 4} at energies below 20 keV. The small C-clusters were produced by a source of negative ion by cesium sputtering with medium beam current. We show that the nonlinear effect in cluster-induced damage is favorable for graphene precipitation compared with monomer carbon ions. The nonlinear damage effect in cluster ion implantation shows positive impact on disorder reduction, film uniformity, and the surface smoothness in graphene synthesis.

  7. Scanning-electron-microscopy observations and mechanical characteristics of ion-beam-sputtered surgical implant alloys

    NASA Technical Reports Server (NTRS)

    Weigand, A. J.; Meyer, M. L.; Ling, J. S.

    1977-01-01

    An electron bombardment ion thruster was used as an ion source to sputter the surfaces of orthopedic prosthetic metals. Scanning electron microscopy photomicrographs were made of each ion beam textured surface. The effect of ion texturing an implant surface on its bond to bone cement was investigated. A Co-Cr-W alloy and surgical stainless steel were used as representative hard tissue implant materials to determine effects of ion texturing on bulk mechanical properties. Work was done to determine the effect of substrate temperature on the development of an ion textured surface microstructure. Results indicate that the ultimate strength of the bulk materials is unchanged by ion texturing and that the microstructure will develop more rapidly if the substrate is heated prior to ion texturing.

  8. The Effect of Annealing at 1500 C on Migration and Release of Ion Implanted Silver in CVD Silicon Carbide

    SciTech Connect

    HJ MacLean; RG Ballinger; LE Kolaya; SA Simonson; N Lewis; M Hanson

    2004-10-07

    The transport of silver in CVD {beta}-SiC has been studied using ion implantation. Silver ions were implanted in {beta}-SiC using the ATLAS accelerator facility at the Argonne National Laboratory. Ion beams with energies of 93 and 161 MeV were used to achieve deposition with peak concentrations at depths of approximately 9 and 13 {micro}m, respectively. As-implanted samples were then annealed at 1500 C for 210 or 480 hours. XPS, SEM, TEM, STEM, and optical methods were used to analyze the material before and after annealing. Silver concentration profiles were determined using XPS before and after annealing. STEM and SEM equipped with quantitative chemical analysis capability were used to more fully characterize the location and morphology of the silver before and after annealing. The results show that, within the uncertainty of measurement techniques, there is no silver migration, via either inter- or intragrannular paths, for the times and temperature studied. Additionally, the silver was observed to phase separate within the SiC after annealing. The irradiation damage from the implantation process resulted in a three-layer morphology in the as-implanted condition: (1) a layer of unaltered SiC, followed by (2) a layer of crystallized SiC, followed by (3) an amorphized layer which contained essentially all of the implanted silver. After annealing the layer structure changed. Layer 1 was unaltered. The grains in layer 2 recrystallized to form an epitaxial (columnar) layer. Layer 3 recrystallized to form a fine grain equiaxed layer. The results of this work do not support the long held assumption that silver release from CVD SiC, used for gas-reactor coated particle fuel, is dominated by grain boundary diffusion.

  9. Effect of implanted species on thermal evolution of ion-induced defects in ZnO

    SciTech Connect

    Azarov, A. Yu.; Rauwel, P.; Kuznetsov, A. Yu.; Svensson, B. G.; Hallén, A.; Du, X. L.

    2014-02-21

    Implanted atoms can affect the evolution of ion-induced defects in radiation hard materials exhibiting a high dynamic annealing and these processes are poorly understood. Here, we study the thermal evolution of structural defects in wurtzite ZnO samples implanted at room temperature with a wide range of ion species (from {sup 11}B to {sup 209}Bi) to ion doses up to 2 × 10{sup 16} cm{sup −2}. The structural disorder was characterized by a combination of Rutherford backscattering spectrometry, nuclear reaction analysis, and transmission electron microscopy, while secondary ion mass spectrometry was used to monitor the behavior of both the implanted elements and residual impurities, such as Li. The results show that the damage formation and its thermal evolution strongly depend on the ion species. In particular, for F implanted samples, a strong out-diffusion of the implanted ions results in an efficient crystal recovery already at 600 °C, while co-implantation with B (via BF{sub 2}) ions suppresses both the F out-diffusion and the lattice recovery at such low temperatures. The damage produced by heavy ions (such as Cd, Au, and Bi) exhibits a two-stage annealing behavior where efficient removal of point defects and small defect clusters occurs at temperatures ∼500 °C, while the second stage is characterized by a gradual and partial annealing of extended defects. These defects can persist even after treatment at 900 °C. In contrast, the defects produced by light and medium mass ions (O, B, and Zn) exhibit a more gradual annealing with increasing temperature without distinct stages. In addition, effects of the implanted species may lead to a nontrivial defect evolution during the annealing, with N, Ag, and Er as prime examples. In general, the obtained results are interpreted in terms of formation of different dopant-defect complexes and their thermal stability.

  10. Effect of implanted species on thermal evolution of ion-induced defects in ZnO

    NASA Astrophysics Data System (ADS)

    Azarov, A. Yu.; Hallén, A.; Du, X. L.; Rauwel, P.; Kuznetsov, A. Yu.; Svensson, B. G.

    2014-02-01

    Implanted atoms can affect the evolution of ion-induced defects in radiation hard materials exhibiting a high dynamic annealing and these processes are poorly understood. Here, we study the thermal evolution of structural defects in wurtzite ZnO samples implanted at room temperature with a wide range of ion species (from 11B to 209Bi) to ion doses up to 2 × 1016 cm-2. The structural disorder was characterized by a combination of Rutherford backscattering spectrometry, nuclear reaction analysis, and transmission electron microscopy, while secondary ion mass spectrometry was used to monitor the behavior of both the implanted elements and residual impurities, such as Li. The results show that the damage formation and its thermal evolution strongly depend on the ion species. In particular, for F implanted samples, a strong out-diffusion of the implanted ions results in an efficient crystal recovery already at 600 °C, while co-implantation with B (via BF2) ions suppresses both the F out-diffusion and the lattice recovery at such low temperatures. The damage produced by heavy ions (such as Cd, Au, and Bi) exhibits a two-stage annealing behavior where efficient removal of point defects and small defect clusters occurs at temperatures ˜500 °C, while the second stage is characterized by a gradual and partial annealing of extended defects. These defects can persist even after treatment at 900 °C. In contrast, the defects produced by light and medium mass ions (O, B, and Zn) exhibit a more gradual annealing with increasing temperature without distinct stages. In addition, effects of the implanted species may lead to a nontrivial defect evolution during the annealing, with N, Ag, and Er as prime examples. In general, the obtained results are interpreted in terms of formation of different dopant-defect complexes and their thermal stability.

  11. Improved corrosion resistance on biodegradable magnesium by zinc and aluminum ion implantation

    NASA Astrophysics Data System (ADS)

    Xu, Ruizhen; Yang, Xiongbo; Suen, Kai Wong; Wu, Guosong; Li, Penghui; Chu, Paul K.

    2012-12-01

    Magnesium and its alloys have promising applications as biodegradable materials, and plasma ion implantation can enhance the corrosion resistance by modifying the surface composition. In this study, suitable amounts of zinc and aluminum are plasma-implanted into pure magnesium. The surface composition, phases, and chemical states are determined, and electrochemical tests and electrochemical impedance spectroscopy (EIS) are conducted to investigate the surface corrosion behavior and elucidate the mechanism. The corrosion resistance enhancement after ion implantation is believed to stem from the more compact oxide film composed of magnesium oxide and aluminum oxide as well as the appearance of the β-Mg17Al12 phase.

  12. Photosensitivity enhancement by H- and He-ion implantation in lead lanthanum zirconate titanate ceramics

    SciTech Connect

    Land, C.E.; Peercy, P.S.

    1980-07-01

    H- and He-ion implantation has been used to increase the photoferroelectric image storage sensitivity of lead lanthanum zirconium titanate ceramics by factors of approx.10 and approx.30, respectively. The increased photosensitivity can be attributed primarily to implantation-produced disorder, which increases the efficiency of carrier photoexcitation and trapping and reduces the exposure energy required to establish nonvolatile space-charge fields. Implantation-induced disorder may also contribute to a substantial increase in photoconductivity in the ion-damaged near-surface region.

  13. Transition metal swift heavy ion implantation on 4H-SiC

    NASA Astrophysics Data System (ADS)

    Ali, A. Ashraf; Kumar, J.; Ramakrishnan, V.; Asokan, K.

    2016-03-01

    This work reports on the realization of Quantum Ring (QR) and Quantum Dot (QD) like structures on 4H-SiC through SHI implantation and on their Raman studies. 4H-SiC is SHI implanted with Transition Metal (TM) Ni ion at different fluences. It is observed that a vibrational mode emerges as the result of Ni ion implantation. The E2 (TO) and the A1 (LO) are suppressed as the fluence increases. In this paper Raman and AFM studies have been performed at room temperature and the queer anomalies are addressed so new devices can be fabricated.

  14. Method of making an ion-implanted planar-buried-heterostructure diode laser

    DOEpatents

    Brennan, Thomas M.; Hammons, Burrell E.; Myers, David R.; Vawter, Gregory A.

    1992-01-01

    Planar-buried-heterostructure, graded-index, separate-confinement-heterostructure semiconductor diode laser 10 includes a single quantum well or multi-quantum well active stripe 12 disposed between a p-type compositionally graded Group III-V cladding lever 14 and an n-type compositionally graded Group III-V cladding layer 16. The laser 10 includes an iion implanted n-type region 28 within the p-type cladding layer 14 and further includes an ion implanted p-type region 26 within the n-type cladding layer 16. The ion implanted regions are disposed for defining a lateral extent of the active stripe.

  15. Ion implantation processing of III-V strained-layer semiconductors

    SciTech Connect

    Myers, D.R.

    1987-01-01

    Ion implantation has had a strong impact on the development of III-V strained-layer semiconductor (SLS) materials and device technologies. Implantation studies have helped delineate the present understanding of strained-layer stability and metastability limits. Resulting ion beam technologies have led to improvements in a variety of SLS discrete devices, including optoelectronic emitters, photodetectors, and field-effect transistors. Both SLS stability criteria and implanted SLS devices are reviewed with respect to future applications in optoelectronics. 36 refs., 2 figs.

  16. Determination of Na acceptor level in Na+ ion-implanted ZnO single crystal

    NASA Astrophysics Data System (ADS)

    Wang, Zheng; Liu, Huibin; He, Haiping; Huang, Jingyun; Chen, Lingxiang; Ye, Zhizhen

    2015-03-01

    Ion implantation was used to dope Na acceptor into ZnO single crystals. With three mixed implantation energies, uniform depth distribution of Na ion in the surface region (~300 nm) of ZnO bulk crystals is achieved. Via post-implantation annealing, a donor-acceptor pair recombination band is identified in the low-temperature photoluminescence spectra, from which the energy level of Na-related acceptor in single crystalline ZnO is estimated to be 300 meV. A p-n junction based on this ZnO-Na layer shows rectifying characteristics, confirming the p-type conductivity.

  17. An Auger Sputter Profiling Study of Nitrogen and Oxygen Ion Implantations in Two Titanium Alloys

    SciTech Connect

    Barton, B. D., Pope, L. E., Wittberg, T. N.

    1989-07-31

    Samples of two titanium alloys, Ti-6A1-4V and Ti-15V-3Cr-3Sn-3A1, were ion implanted with a combination of nitrogen (N+) and oxygen (O+). For each alloy, implantation parameters were chosen to give implanted nitrogen concentrations of approximately 10 or 50 atomic percent, from a depth of 100 nanometers to a depth of 400 nanometers. In all but one case, dual energy (200 keV and 90 keV) implantations of nitrogen were used to give a relatively uniform nitrogen concentration to a depth of 300 nanometers. In each case, oxygen was implanted at 35 keV, following the nitrogen implantation, to give an oxygen-enriched region near the surface. The implanted samples were then examined by Auger electron spectroscopy (AES) combined with argon ion sputtering. In order to determine the stoichiometry of the nitrogen implanted regions, it was necessary to determine the N (KVV) contribution to the overlapping N (KVV) and Ti (LMM) Auger transitions. It was also necessary to correct for the ion-bombardment-induced compositional changes which have been described in an earlier study of titanium nitride thin films. The corrected AES depth profiles were in good agreement with theoretical predictions.

  18. Microstructure and mechanical properties of Fe alloys ion implanted with Ti and N

    NASA Astrophysics Data System (ADS)

    Folistaedt, D. M.; Knapp, J. A.; Pope, L. E.; Picraux, S. T.

    1985-10-01

    The microstructure resulting when Ti and N are both ion-implanted into pure Fe at room temperature has been examined with ion beam analysis, transmission electron microscopy, and electron energy loss spectroscopy. Precipitates of TiN form within the bcc Fe matrix, in contrast to the amorphous phase which forms when Ti and C are both implanted. For comparison, the microstructure resulting when N alone is implanted into Fe was also examined, and Fe 2N precipitates were observed within the Fe matrix. The surface mechanical properties of 15-5 PH steel which was implanted with both Ti and N were examined with pin-on-disc testing, and the results were interpreted in terms of the microstructures observed in Fe. The modifications produced by Ti + N implantation are the same as observed with other treatments producing hard nitrides or carbides within the iron-based matrix: reduced wear is observed, but not reduced friction.

  19. Corrosion resistance and antithrombogenic behavior of La and Nd ion implanted stainless steels

    SciTech Connect

    Jing, F. J.; Jin, F. Y.; Liu, Y. W.; Wan, G. J.; Liu, X. M.; Zhao, X. B.; Fu, R. K. Y.; Leng, Y. X.; Huang, N.; Chu, Paul K.

    2006-09-15

    Lanthanide ions such as lanthanum (La) and neodymium (Nd) were implanted into 316 stainless steel samples using metal vapor vacuum arc to improve the surface corrosion resistance and antithrombogenic properties. X-ray photoelectron spectroscopy shows that lanthanum and neodymium exist in the +3 oxidation state in the surface layer. The corrosion properties of the implanted and untreated control samples were investigated utilizing electrochemical tests and our results show that La and Nd implantations enhance the surface corrosion resistance. In vitro activated partial thromboplastin time (APTT) tests were used to evaluate the antithrombogenic properties. The APTT time of the implanted samples was observed to be prolonged compared to that of the unimplanted stainless steel control. La and Nd ion implantations can be used to improve the surface corrosion resistance and biomedical properties of 316 stainless steels.

  20. Non-mass-analyzed ion implantation from a solid phosphorus source

    NASA Technical Reports Server (NTRS)

    Spitzer, M. B.; Bunker, S. N.

    1982-01-01

    A phosphorus ion beam, extracted from a Freeman ion source charged with elemental phosphorus, has been investigated for use in solar cell fabrication. Mass spectroscopy of the beam indicates the absence of both minority-carrier lifetime degrading impurities and hydrogen. The ion beam, without mass analysis, was used for ion implantation of solar cells, and performance for all cells was found to be equivalent to mass-analyzed controls.

  1. Synergistic effects of iodine and silver ions co-implanted in 6H-SiC

    NASA Astrophysics Data System (ADS)

    Kuhudzai, R. J.; Malherbe, J. B.; Hlatshwayo, T. T.; van der Berg, N. G.; Devaraj, A.; Zhu, Z.; Nandasiri, M.

    2015-12-01

    Motivated by the aim of understanding the release of fission products through the SiC coating of fuel kernels in modern high temperature nuclear reactors, a fundamental investigation is conducted to understand the synergistic effects of implanted silver (Ag) and iodine (I) in 6H-SiC. The implantation of the individual species, as well as the co-implantation of 360 keV ions of I and Ag at room temperature in 6H-SiC and their subsequent annealing behaviour has been investigated by Secondary Ion Mass Spectrometry (SIMS), Atom Probe Tomography (APT) and X-ray Photoelectron Spectroscopy (XPS). SIMS and APT measurements indicated the presence of Ag in the co-implanted samples after annealing at 1500 °C for 30 h in sharp contrast to the samples implanted with Ag only. In samples implanted with Ag only, complete loss of the implanted Ag was observed. However, for I only implanted samples, some iodine was retained. APT of annealed co-implanted 6H-SiC showed clear spatial association of Ag and I clusters in SiC, which can be attributed to the observed I assisted retention of Ag after annealing. Such detailed studies will be necessary to identify the fundamental mechanism of fission products migration through SiC coatings.

  2. Ion implantation for high performance III-V JFETS and HFETS

    SciTech Connect

    Zolper, J.C.; Baca, A.G.; Sherwin, M.E.; Klem, J.F.

    1996-06-01

    Ion implantation has been an enabling technology for realizing many high performance electronic devices in III-V semiconductor materials. We report on advances in ion implantation processing for GaAs JFETs (joint field effect transistors), AlGaAs/GaAs HFETs (heterostructure field effect transistors), and InGaP or InAlP-barrier HFETs. The GaAs JFET has required the development of shallow p-type implants using Zn or Cd with junction depths down to 35 nm after the activation anneal. Implant activation and ionization issues for AlGaAs are reported along with those for InGaP and InAlP. A comprehensive treatment of Si-implant doping of AlGaAs is given based on donor ionization energies and conduction band density-of-states dependence on Al-composition. Si and Si+P implants in InGaP are shown to achieve higher electron concentrations than for similar implants in AlGaAs due to absence of the deep donor level. An optimized P co- implantation scheme in InGaP is shown to increase the implanted donor saturation level by 65%.

  3. Synergistic Effects of Iodine and Silver Ions Co-Implanted in 6H-SiC

    SciTech Connect

    Kuhudzai, Remeredzai J.; Malherbe, Johan; Hlatshwayo, T. T.; van der Berg, N. G.; Devaraj, Arun; Zhu, Zihua; Nandasiri, Manjula I.

    2015-10-23

    Motivated by the aim of understanding the release of fission products through the SiC coating of fuel kernels in modern high temperature nuclear reactors, a fundamental investigation is conducted to understand the synergistic effects of implanted silver (Ag) and iodine (I) in 6H-SiC. The implantation of the individual species, as well as the co-implantation of 360 keV ions of I and Ag at room temperature in 6H-SiC and their subsequent annealing behavior has been investigated by Secondary Ion Mass Spectrometry (SIMS), Atom Probe Tomography (APT) and X-ray Photoelectron Spectroscopy (XPS). SIMS and APT measurements indicated the presence of Ag in the co-implanted samples after annealing at 1500 ºC for 30 hours in sharp contrast to the samples implanted with Ag only. In samples implanted with Ag only, complete loss of the implanted Ag was observed. However, for I only implanted samples, some iodine was retained. APT of annealed co-implanted 6H-SiC showed clear spatial association of Ag and I clusters in SiC, which can be attributed to the observed I assisted retention of Ag after annealing. Such detailed studies will be necessary to identify the fundamental mechanism of fission products migration through SiC coatings.

  4. X-ray rocking curve analysis of ion implanted mercury cadmium telluride

    NASA Astrophysics Data System (ADS)

    Williams, B. L.; Robinson, H. G.; Helms, C. R.; Zhu, N.

    1997-06-01

    Junction formation by ion implantation is a critical step in producing high quality infrared focal plane arrays in mercury cadmium telluride (MCT). We have analyzed the structural properties of MCT implanted with B at doses of 1014 and 1015 cm-2 using double and triple crystal x-ray diffraction (DCD and TCD) to monitor the disorder and strain of the implanted region as a function of processing conditions. TCD (333) reflections show that a distinct tensile peak is produced by the high dose implant while the low dose implant shows only a low angle shoulder on the substrate peak. A preliminary association of the low angle shoulder with point defects has been made since no extended defects have been observed in the low dose range. For the high dose implant, extended defect formation has been reported and may be responsible for the tensile peak. After annealing, the low angle shoulder on the low dose implant has disappeared, while the high dose implant exhibits an increase in the tensile strain from 6.5 × 10-4 to 9.3 × 10-4 after 24 h of annealing and then decreases in tensile strain to 7.3 × 10-4 after 48 h of annealing. It is believed the changes in strain are associated with the Oswald ripening and dissolution of extended defects, which has been observed during annealing of ion implanted Si.

  5. Decrease of Staphylococcal adhesion on surgical stainless steel after Si ion implantation

    NASA Astrophysics Data System (ADS)

    Braceras, Iñigo; Pacha-Olivenza, Miguel A.; Calzado-Martín, Alicia; Multigner, Marta; Vera, Carolina; Broncano, Luis Labajos-; Gallardo-Moreno, Amparo M.; González-Carrasco, José Luis; Vilaboa, Nuria; González-Martín, M. Luisa

    2014-08-01

    316LVM austenitic stainless steel is often the material of choice on temporal musculoskeletal implants and surgical tools as it combines good mechanical properties and acceptable corrosion resistance to the physiologic media, being additionally relatively inexpensive. This study has aimed at improving the resistance to bacterial colonization of this surgical stainless steel, without compromising its biocompatibility and resistance. To achieve this aim, the effect of Si ion implantation on 316LVM has been studied. First, the effect of the ion implantation parameters (50 keV; fluence: 2.5-5 × 1016 ions/cm2; angle of incidence: 45-90°) has been assessed in terms of depth profiling of chemical composition by XPS and nano-topography evaluation by AFM. The in vitro biocompatibility of the alloy has been evaluated with human mesenchymal stem cells. Finally, bacterial adhesion of Staphylococcus epidermidis and Staphylococcus aureus on these surfaces has been assessed. Reduction of bacterial adhesion on Si implanted 316LVM is dependent on the implantation conditions as well as the features of the bacterial strains, offering a promising implantable biomaterial in terms of biocompatibility, mechanical properties and resistance to bacterial colonization. The effects of surface composition and nano-topography on bacterial adhesion, directly related to ion implantation conditions, are also discussed.

  6. Dynamics of Faceted Nanoparticles Formation in a Crystalline Matrix During Ion Implantation Processing.

    PubMed

    Li, Kun-Dar

    2016-02-01

    The faceted nanoparticle synthesized by ion implantation, such as Zn, Cu or Ag nanoparticles, is one of the promising materials for the next generation of optical devices. To understand and better control the manufacturing processes of ion implantation, a theoretical model is applied to investigate the formation and evolution of faceted nanoparticles under various experimental conditions of implantation processing. In this study, the mechanisms of the anisotropic interfacial energy and kinetics with different ion distributions are taken into consideration to demonstrate the role of the crystallographic symmetry, ion energy and temperature on the faceted nanoparticles formation in a crystalline matrix. As presented in the numerical results, the morphological shape of the nanoparticles is mainly affected by the crystallographic symmetry, while the distribution of the precipitates is principally determined by the ion energy. For the condition of high-temperature implantation, a high mobility of ions causes the characteristic length of nanostructures to increase and creates a coarsening morphology of nanoparticles. It is attributed to a longer diffusion distance during the nucleation and growth processes. This model can be widely used for the predictions of the nanostructures formation with various ion implantation processes. PMID:27433726

  7. Zinc ion implantation‑deposition technique improves the osteoblast biocompatibility of titanium surfaces.

    PubMed

    Liang, Yongqiang; Xu, Juan; Chen, Jing; Qi, Mengchun; Xie, Xuehong; Hu, Min

    2015-06-01

    The plasma immersion ion implantation and deposition (PIIID) technique was used to implant zinc (Zn) ions into smooth surfaces of pure titanium (Ti) disks for investigation of tooth implant surface modification. The aim of the present study was to evaluate the surface structure and chemical composition of a modified Ti surface following Zn ion implantation and deposition and to examine the effect of such modification on osteoblast biocompatibility. Using the PIIID technique, Zn ions were deposited onto the smooth surface of pure Ti disks. The physical structure and chemical composition of the modified surface layers were characterized by scanning electron microscopy (SEM) and X‑ray photoelectron spectroscopy (XPS), respectively. In vitro culture assays using the MG‑63 bone cell line were performed to determine the effects of Zn‑modified Ti surfaces following PIIID on cellular function. Acridine orange staining was used to detect cell attachment to the surfaces and cell cycle analysis was performed using flow cytometry. SEM revealed a rough 'honeycomb' structure on the Zn‑modified Ti surfaces following PIIID processing and XPS data indicated that Zn and oxygen concentrations in the modified Ti surfaces increased with PIIID processing time. SEM also revealed significantly greater MG‑63 cell growth on Zn‑modified Ti surfaces than on pure Ti surfaces (P<0.05). Flow cytometric analysis revealed increasing percentages of MG‑63 cells in S phase with increasing Zn implantation and deposition, suggesting that MG‑63 apoptosis was inhibited and MG‑63 proliferation was promoted on Zn‑PIIID‑Ti surfaces. The present results suggest that modification with Zn‑PIIID may be used to improve the osteoblast biocompatibility of Ti implant surfaces. PMID:25673139

  8. Sources and transport systems for low energy extreme of ion implantation

    SciTech Connect

    Hershcovitch, A.; Batalin, V.A.; Bugaev, A.S.; Gushenets, V.I.; Alexeyenko, O.; Gurkova, E.; Johnson, B.M.; Kolomiets, A.A.; Kropachev, G.N.; Kuibeda, R.P.; Kulevoy, T.V.; Masunov, E.S.; Oks, E.M.; Pershin, V.I.; Polozov, S.M.; Poole, H.J.; Seleznev, D.N.; Storozhenko, P.A.; Vizir, A.; Svarovski, A.Ya.; Yakushin, P.; Yushkov, G.Yu.

    2010-06-06

    For the past seven years a joint research and development effort focusing on the design of steady state, intense ion sources has been in progress with the ultimate goal being to meet the two, energy extreme range needs of mega-electron-volt and 100's of electron-volt ion implanters. However, since the last Fortier is low energy ion implantation, focus of the endeavor has shifted to low energy ion implantation. For boron cluster source development, we started with molecular ions of decaborane (B{sub 10}H{sub 14}), octadecaborane (B{sub 18}H{sub 22}), and presently our focus is on carborane (C{sub 2}B{sub 10}H{sub 12}) ions developing methods for mitigating graphite deposition. Simultaneously, we are developing a pure boron ion source (without a working gas) that can form the basis for a novel, more efficient, plasma immersion source. Our Calutron-Berna ion source was converted into a universal source capable of switching between generating molecular phosphorous P{sub 4}{sup +}, high charge state ions, as well as other types of ions. Additionally, we have developed transport systems capable of transporting a very large variety of ion species, and simulations of a novel gasless/plasmaless ion beam deceleration method were also performed.

  9. Selective nucleation induced by defect nanostructures: A way to control cobalt disilicide precipitation during ion implantation

    SciTech Connect

    Fortuna, F.; Nguyen, M.-A.; Ruault, M.-O.; Kirk, M. A.; Borodin, V. A.; Ganchenkova, M. G.

    2012-12-15

    In this paper, we show a way to control cobalt disilicide precipitation during Co ion implantation at high temperatures (650 Degree-Sign C) by affecting radiation defects involved in precipitate nucleation and growth. We demonstrate that the relative shares of different precipitate types nucleated by implantation are strongly affected by defect microstructures deliberately created in investigated samples prior to cobalt implantation. Especially interesting is the effect of a dense ensemble of extremely small (1-3 nm) cavities, which promotes the formation of a relatively uniform layer of coherent cobalt disilicide precipitates with a narrow size distribution. In order to better understand the mechanism of the microstructural influence on the precipitate nucleation modes during Co implantation, we investigate the disilicide precipitation using different implantation setups and compare the results with those for cavity-free Si specimens implanted in similar conditions.

  10. Selective nucleation induced by defect nanostructures: A way to control cobalt disilicide precipitation during ion implantation

    NASA Astrophysics Data System (ADS)

    Fortuna, F.; Nguyen, M.-A.; Ruault, M.-O.; Kirk, M. A.; Borodin, V. A.; Ganchenkova, M. G.

    2012-12-01

    In this paper, we show a way to control cobalt disilicide precipitation during Co ion implantation at high temperatures (650 °C) by affecting radiation defects involved in precipitate nucleation and growth. We demonstrate that the relative shares of different precipitate types nucleated by implantation are strongly affected by defect microstructures deliberately created in investigated samples prior to cobalt implantation. Especially interesting is the effect of a dense ensemble of extremely small (1-3 nm) cavities, which promotes the formation of a relatively uniform layer of coherent cobalt disilicide precipitates with a narrow size distribution. In order to better understand the mechanism of the microstructural influence on the precipitate nucleation modes during Co implantation, we investigate the disilicide precipitation using different implantation setups and compare the results with those for cavity-free Si specimens implanted in similar conditions.

  11. Formation of Wear Resistant Steel Surfaces by Plasma Immersion Ion Implantation

    SciTech Connect

    Maendl, S.; Rauschenbach, B.

    2003-08-26

    Plasma immersion ion implantation (PIII) is a versatile and fast method for implanting energetic ions into large and complex shaped three-dimensional objects where the ions are accelerated by applying negative high voltage pulses to a substrate immersed in a plasma. As the line-of-sight restrictions of conventional implanters are circumvented, it results in a fast and cost-effective technology. Implantation of nitrogen at 30 - 40 keV at moderate temperatures of 200 - 400 deg. C into steel circumvents the diminishing thermal nitrogen activation encountered, e.g., in plasma nitriding in this temperature regime, thus enabling nitriding of additional steel grades. Nitride formation and improvement of the mechanical properties after PIII are presented for several steel grades, including AISI 316Ti (food industry), AISI D2 (used for bending tools) and AISI 1095 (with applications in the textile industry)

  12. Ring-type ESD damage caused by electrostatic chuck of ion implanter

    NASA Astrophysics Data System (ADS)

    King, Mingchu; Hsu, Chun-Keng; Fu, Chiang; Huang, Hsin-Chie; Yang, Shih-Yi; Liu, Yuan-Lung; Hsu, Kuo-chin

    1999-04-01

    Electrostatic discharge (ESD) due to electrostatic chuck (ESC) during ion implantation was observed in our fab. This defect could burn out the inter-layer dielectric and jeopardize the circuit performance. the yield impact on 0.35 micrometers product could be 40 percent. The defect distributed around the wafer edge and has a ring-type map. This defect occurred right after ESD implantation. The fringe field of the electrostatic chuck is the key reason why ring-type electrostatic discharge damage happened right after ion implantation. Our experimental result also showed that the junction characterization and surface conductivity will influence the probability of ESD damage caused by electrostatic chuck of ion implanter.

  13. Plasma source ion implantation to increase the adhesion of subsequently deposited coatings

    SciTech Connect

    Wood, B.P.; Walter, K.C.; Taylor, T.N.

    1997-10-01

    In Plasma Source Ion Implantation (PSII) an object is placed in a plasma and pulse biased to a high negative potential, so as to implant the plasma ions into the surface of the object. Although ion implantation, by itself, can yield desirable surface modification, it is even more useful as a method of creating a functionally graded interface between the substrate material and a subsequently deposited coating, which may be produced by altering operating conditions on the same plasma source. Although this interfacial region is very thin - as little as 20 nm - it can greatly increase the adhesion of the deposited coatings. We present here a description of this process, and compare a simulation of the graded interface with an XPS depth profile of the interfacial region for erbium metal implanted into steel.

  14. Voltage dependence of cluster size in carbon films using plasma immersion ion implantation

    NASA Astrophysics Data System (ADS)

    McKenzie, D. R.; Tarrant, R. N.; Bilek, M. M. M.; Pearce, G.; Marks, N. A.; McCulloch, D. G.; Lim, S. H. N.

    2003-05-01

    Carbon films were prepared using a cathodic arc with plasma immersion ion implantation (PIII). Using Raman spectroscopy to determine cluster size, a comparison is made between cluster sizes at high voltage and a low duty cycle of pulses with the cluster sizes produced at low voltage and a higher duty cycle. We find that for ion implantation in the range 2-20 kV, the cluster size depends more on implantation energy ( E) than implantation frequency ( f), unlike stress relief, which we have previously shown [M.M.M. Bilek, et al., IEEE Trans. in Plasma Sci., Proceedings 20th ISDEIV 1-5 July 2002, Tours, France, Cat. No. 02CH37331, IEEE, Piscataway, NJ, USA, p. 95] to be dependent on the product Ef. These differences are interpreted in terms of a model in which the ion impacts create thermal spikes.

  15. Effects of sequential tungsten and helium ion implantation on nano-indentation hardness of tungsten

    SciTech Connect

    Armstrong, D. E. J.; Edmondson, P. D.; Roberts, S. G.

    2013-06-24

    To simulate neutron and helium damage in a fusion reactor first wall sequential self-ion implantation up to 13 dpa followed by helium-ion implantation up to 3000 appm was performed to produce damaged layers of {approx}2 {mu}m depth in pure tungsten. The hardness of these layers was measured using nanoindentation and was studied using transmission electron microscopy. Substantial hardness increases were seen in helium implanted regions, with smaller hardness increases in regions which had already been self-ion implanted, thus, containing pre-existing dislocation loops. This suggests that, for the same helium content, helium trapped in distributed vacancies gives stronger hardening than helium trapped in vacancies condensed into dislocation loops.

  16. Fabrication of highly homogeneous surface-enhanced Raman scattering substrates using Ag ion implantation

    NASA Astrophysics Data System (ADS)

    Li, Wenqing; Xiao, Xiangheng; Dai, Zhigao; Wu, Wei; Cheng, Li; Mei, Fei; Zhang, Xingang; Jiang, Changzhong

    2016-06-01

    In recent times, surface-enhanced Raman scattering (SERS) has attracted attention for its excellent potential application in chemical and biological detection. In this work, we demonstrate that a highly homogeneous SERS substrate can be realized by Ag ion implantation and the subsequent annealing process. Both the implantation and annealing parameters have been optimized for a high sensitivity SERS substrate. The SERS measurement indicates that a sample implanted by 20 kV Ag ions with a dosage of 3  ×  1016 ions cm‑2 exhibits the highest SERS activity. In addition, the SERS activity of the Ag-implanted substrates depends highly on the annealing temperature and time. Since none of the fabrication processes contain chemical reactions, our substrate is a clean system without any chemical residues.

  17. Modification of the optical spectra of glass by metal ion implantation

    NASA Astrophysics Data System (ADS)

    Yao, X. Y.; Fojas, P. B.; Brown, I. G.; Rubin, M. D.

    1993-06-01

    We have carried out some exploratory investigations of the effect of metal ion implantation on the optical transmission characteristics of glass. The implants were done using the vacuum-arc-based high current metal ion implantation facility developed at Berkeley. The implanted doses were from 3 × 10 16 to 1 × 10 17 cm -2 and the energy was mostly 60 keV. A range of different metal ion species was used, including C, Al, Si, Ti, Fe, Ni, Cu, Y, Ag, Pt and Au. We used soda lime-silica glass (window glass), boron-silica glass (microscope slides), and tin oxide coated glass. The transmission of the glass samples to optical radiation in the wavelength range 300 to 2400 nm was measured. Here we outline the procedure and describe the results of the optical transmission measurements.

  18. Application of a pulsed, RF-driven, multicusp source for low energy plasma immersion ion implantation

    SciTech Connect

    Wengrow, A.B.; Leung, K.N.; Perkins, L.T.; Pickard, D.S.; Rickard, M.; Williams, M.D.; Tucker, M.

    1996-06-01

    The multicusp ion source can produce large volumes of uniform, quiescent, high density plasmas. A plasma chamber suited for plasma immersion ion implantation (PIII) was readily made. Conventional PIII pulses the bias voltage applied to the substrate which is immersed in a CW mode plasma. Here, a method by which the plasma itself is pulsed was developed. Typically pulse lengths of 500 {mu}s are used and are much shorter than that of the substrate voltage pulse (5-15 ms). This approach, together with low gas pressures and low bias voltages, permits the constant energy implantation of an entire wafer simultaneously without glow discharge. Results show that this process can yield implant currents of up to 2.5 mA/cm{sup 2}; thus very short implant times can be achieved. Uniformity of the ion flux is also discussed. As this method can be scaled to any dimension, it can be made to handle any size wafer.

  19. Depth concentrations of deuterium ions implanted into some pure metals and alloys

    NASA Astrophysics Data System (ADS)

    Didyk, A. Yu.; Wiśniewski, R.; Kitowski, K.; Kulikauskas, V.; Wilczynska, T.; Hofman, A.; Shiryaev, A. A.; Zubavichus, Ya. V.

    2012-01-01

    Pure metals (Cu, Ti, Zr, V, Pd) and diluted Pd alloys (Pd-Ag, Pd-Pt, Pd-Ru, Pd-Rh) were implanted by 25-keV deuterium ions at fluences in the range (1.2-2.3) × 1022 m-2. The post-treatment depth distributions of deuterium ions were measured 10 days and three months after the implantation by using Elastic Recoil Detection Analysis (ERDA) and Rutherford Backscattering (RBS). Comparison of the obtained results allowed us to make conclusions about relative stability of deuterium and hydrogen gases in pure metals and diluted Pd alloys. Very high diffusion rates of implanted deuterium ions in V and Pd pure metals and Pd alloys were observed. Small-angle X-ray scattering revealed formation of nanosized defects in implanted corundum and titanium.

  20. Fabrication of highly homogeneous surface-enhanced Raman scattering substrates using Ag ion implantation.

    PubMed

    Li, Wenqing; Xiao, Xiangheng; Dai, Zhigao; Wu, Wei; Cheng, Li; Mei, Fei; Zhang, Xingang; Jiang, Changzhong

    2016-06-29

    In recent times, surface-enhanced Raman scattering (SERS) has attracted attention for its excellent potential application in chemical and biological detection. In this work, we demonstrate that a highly homogeneous SERS substrate can be realized by Ag ion implantation and the subsequent annealing process. Both the implantation and annealing parameters have been optimized for a high sensitivity SERS substrate. The SERS measurement indicates that a sample implanted by 20 kV Ag ions with a dosage of 3  ×  10(16) ions cm(-2) exhibits the highest SERS activity. In addition, the SERS activity of the Ag-implanted substrates depends highly on the annealing temperature and time. Since none of the fabrication processes contain chemical reactions, our substrate is a clean system without any chemical residues. PMID:27167880