Investigation of ISIS and Brookhaven National Laboratory ion source electrodes after extended operation

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lettry J.; Alessi J.; Faircloth, D.

2012-02-23

Linac4 accelerator of Centre Europeen de Recherches Nucleaires is under construction and a RF-driven H{sup -} ion source is being developed. The beam current requirement for Linac4 is very challenging: 80 mA must be provided. Cesiated plasma discharge ion sources such as Penning or magnetron sources are also potential candidates. Accelerator ion sources must achieve typical reliability figures of 95% and above. Investigating and understanding the underlying mechanisms involved with source failure or ageing is critical when selecting the ion source technology. Plasma discharge driven surface ion sources rely on molybdenum cathodes. Deformation of the cathode surfaces is visible aftermore » extended operation periods. A metallurgical investigation of an ISIS ion source is presented. The origin of the deformation is twofold: Molybdenum sputtering by cesium ions digs few tenths of mm cavities while a growth of molybdenum is observed in the immediate vicinity. The molybdenum growth under hydrogen atmosphere is hard and loosely bound to the bulk. It is, therefore, likely to peel off and be transported within the plasma volume. The observation of the cathode, anode, and extraction electrodes of the magnetron source operated at BNL for two years are presented. A beam simulation of H{sup -}, electrons, and Cs{sup -} ions was performed with the IBSimu code package to qualitatively explain the observations. This paper describes the operation conditions of the ion sources and discusses the metallurgical analysis and beam simulation results.« less

Investigation of ISIS and Brookhaven National Laboratory ion source electrodes after extended operation

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lettry, J.; Gerardin, A.; Pereira, H.

2012-02-15

Linac4 accelerator of Centre Europeen de Recherches Nucleaires is under construction and a RF-driven H{sup -} ion source is being developed. The beam current requirement for Linac4 is very challenging: 80 mA must be provided. Cesiated plasma discharge ion sources such as Penning or magnetron sources are also potential candidates. Accelerator ion sources must achieve typical reliability figures of 95% and above. Investigating and understanding the underlying mechanisms involved with source failure or ageing is critical when selecting the ion source technology. Plasma discharge driven surface ion sources rely on molybdenum cathodes. Deformation of the cathode surfaces is visible aftermore » extended operation periods. A metallurgical investigation of an ISIS ion source is presented. The origin of the deformation is twofold: Molybdenum sputtering by cesium ions digs few tenths of mm cavities while a growth of molybdenum is observed in the immediate vicinity. The molybdenum growth under hydrogen atmosphere is hard and loosely bound to the bulk. It is, therefore, likely to peel off and be transported within the plasma volume. The observation of the cathode, anode, and extraction electrodes of the magnetron source operated at BNL for two years are presented. A beam simulation of H{sup -}, electrons, and Cs{sup -} ions was performed with the IBSimu code package to qualitatively explain the observations. This paper describes the operation conditions of the ion sources and discusses the metallurgical analysis and beam simulation results.« less

A cookbook for building a high-current dimpled H – magnetron source for accelerators

DOE PAGES

Bollinger, Daniel S.; Karns, Patrick R.; Tan, Cheng -Yang

2015-10-30

A high-current (>50 mA) dimpled H – magnetron source has been built at Fermilab for supplying H – beam to the entire accelerator complex. Despite many decades of expertise with slit H – magnetron sources at Fermilab, we were faced with many challenges from the dimpled H – magnetron source, which needed to be overcome in order to make it operational. Dimpled H – sources for high-energy physics are not new: Brookhaven National Laboratory has operated a dimpled H- source for more than two decades. However, the transference of that experience to Fermilab took about two years because a cookbookmore » for building this type of source did not exist and seemingly innocuous or undocumented choices had a huge impact on the success or failure for this type of source. Moreover, it is the goal of this paper to document the reasons for these choices and to present a cookbook for building and operating dimpled H – magnetron sources.« less

The characteristics of a new negative metal ion beam source and its applications

NASA Astrophysics Data System (ADS)

Paik, Namwoong

2001-10-01

Numerous efforts at energetic thin film deposition processes using ion beams have been made to meet the demands of today's thin film industry. As one of these efforts, a new Magnetron Sputter Negative Ion Source (MSNIS) was developed. In this study, the development and the characterization of the MSNIS were investigated. Amorphous carbon films were used as a sample coating medium to evaluate the ion beam energy effect. A review of energetic Physical Vapor Deposition (PVD) techniques is presented in Chapter 1. The energetic PVD methods can be classified into two major categories: the indirect ion beam method Ion Beam Assisted Deposition (IBAD), and the direct ion beam method-Direct Ion Beam Deposition (DIBD). In this chapter, currently available DIBD processes such as Cathodic Arc, Laser Ablation, Ionized Physical Vapor Deposition (I-PVD) and Magnetron Sputter Negative Ion Source (MSNIS) are individually reviewed. The design and construction of the MSNIS is presented in chapter 2. The MSNIS is a hybrid of the conventional magnetron sputter configuration and the cesium surface ionizer. The negative sputtered ions are produced directly from the sputter target by surface ionization. In chapter 3, the ion beam and plasma characteristics of an 8″ diameter MSNIS are investigated using a retarding field analyzer and a cylindrical Langmuir Probe. The measured electron temperature is approximately 2-5 eV, while the plasma density and plasma potential were of the order of 10 11-1012 cm3 and 5-20 V, respectively, depending on the pressure and power. In chapter 4, in order to evaluate the effect of the ion beam on the resultant films, amorphous carbon films were deposited under various conditions. The structure of carbon films was investigated using Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). The result suggests the fraction of spa bonding is more than 70% in some samples prepared by MSNIS while magnetron sputtered samples showed less than 30%. (Abstract

Boron ion beam generation utilizing lanthanum hexaboride cathodes: Comparison of vacuum arc and planar magnetron glow

DOE Office of Scientific and Technical Information (OSTI.GOV)

Nikolaev, A. G.; Vizir, A. V.; Yushkov, G. Yu., E-mail: gyushkov@mail.ru

Boron ion beams are widely used for semiconductor ion implantation and for surface modification for improving the operating parameters and increasing the lifetime of machine parts and tools. For the latter application, the purity requirements of boron ion beams are not as stringent as for semiconductor technology, and a composite cathode of lanthanum hexaboride may be suitable for the production of boron ions. We have explored the use of two different approaches to boron plasma production: vacuum arc and planar high power impulse magnetron in self-sputtering mode. For the arc discharge, the boron plasma is generated at cathode spots, whereasmore » for the magnetron discharge, the main process is sputtering of cathode material. We present here the results of comparative test experiments for both kinds of discharge, aimed at determining the optimal discharge parameters for maximum yield of boron ions. For both discharges, the extracted ion beam current reaches hundreds of milliamps and the fraction of boron ions in the total extracted ion beam is as high as 80%.« less

Research and Development for an Alternative RF Source Using Magnetrons in CEBAF

NASA Astrophysics Data System (ADS)

Jacobs, Andrew

2016-09-01

At Jefferson Lab, klystrons are currently used as a radiofrequency (RF) power source for the 1497 MHz Continuous Electron Beam Accelerator Facility (CEBAF) Continuous Wave (CW) system. A drop-in replacement for the klystrons in the form of a system of magnetrons is being developed. The klystron DC-RF efficiency at CEBAF is 35-51% while the estimated magnetron efficiency is 80-90%. Thus, the introduction of magnetrons to CEBAF will have enormous benefits in terms of electrical power saving. The primary focus of this project was to characterize a magnetron's frequency pushing and pulling curves at 2.45 GHz with stub tuner and anode current adjustments so that a Low Level RF controller for a new 1.497 GHz magnetron can be built. A Virtual Instrument was created in LabVIEW, and data was taken. The resulting data allowed for the creation of many constant lines of frequency and output power. Additionally, the results provided a characterization of magnetron oven temperature drift over the operation time and the relationship between anode current and frequency. Using these results, the control model of different variables and their feedback or feedforward that affect the frequency pushing and pulling of the magnetron is better developed. Department of Energy, Science Undergraduate Laboratory Internships, and Jefferson Lab.

H- ion sources for CERN's Linac4

NASA Astrophysics Data System (ADS)

Lettry, J.; Aguglia, D.; Coutron, Y.; Chaudet, E.; Dallocchio, A.; Gil Flores, J.; Hansen, J.; Mahner, E.; Mathot, S.; Mattei, S.; Midttun, O.; Moyret, P.; Nisbet, D.; O'Neil, M.; Paoluzzi, M.; Pasquino, C.; Pereira, H.; Arias, J. Sanchez; Schmitzer, C.; Scrivens, R.; Steyaert, D.

2013-02-01

The specifications set to the Linac4 ion source are: H- ion pulses of 0.5 ms duration, 80 mA intensity and 45 keV energy within a normalized emittance of 0.25 mmmrad RMS at a repetition rate of 2 Hz. In 2010, during the commissioning of a prototype based on H- production from the plasma volume, it was observed that the powerful co-extracted electron beam inherent to this type of ion source could destroy its electron beam dump well before reaching nominal parameters. However, the same source was able to provide 80 mA of protons mixed with a small fraction of H2+ and H3+ molecular ions. The commissioning of the radio frequency quadrupole accelerator (RFQ), beam chopper and H- beam diagnostics of the Linac4 are scheduled for 2012 and its final installation in the underground building is to start in 2013. Therefore, a crash program was launched in 2010 and reviewed in 2011 aiming at keeping the original Linac4 schedule with the following deliverables: Design and production of a volume ion source prototype suitable for 20-30 mA H- and 80 mA proton pulses at 45 keV by mid-2012. This first prototype will be dedicated to the commissioning of the low energy components of the Linac4. Design and production of a second prototype suitable for 40-50 mA H- based on an external RF solenoid plasma heating and cesiated-surface production mechanism in 2013 and a third prototype based on BNL's Magnetron aiming at reliable 2 Hz and 80 mA H- operations in 2014. In order to ease the future maintenance and allow operation with Ion sources based on three different production principles, an ion source "front end" providing alignment features, pulsed gas injection, pumping units, beam tuning capabilities and pulsed bipolar high voltage acceleration was designed and is being produced. This paper describes the progress of the Linac4 ion source program, the design of the Front end and first ion source prototype. Preliminary results of the summer 2012 commissioning are presented. The outlook on

Design of a new electron cyclotron resonance ion source at Oshima National College of Maritime Technology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Asaji, T., E-mail: asaji@oshima-k.ac.jp; Hirabara, N.; Izumihara, T.

A new electron cyclotron resonance ion/plasma source has been designed and will be built at Oshima National College of Maritime Technology by early 2014. We have developed an ion source that allows the control of the plasma parameters over a wide range of electron temperatures for material research. A minimum-B magnetic field composed of axial mirror fields and radial cusp fields was designed using mainly Nd-Fe-B permanent magnets. The axial magnetic field can be varied by three solenoid coils. The apparatus has 2.45 GHz magnetron and 2.5–6.0 GHz solid-state microwave sources.

High-intensity polarized H- ion source for the RHIC SPIN physics

NASA Astrophysics Data System (ADS)

Zelenski, A.; Atoian, G.; Raparia, D.; Ritter, J.; Kolmogorov, A.; Davydenko, V.

2017-08-01

A novel polarization technique had been successfully implemented for the RHIC polarized H- ion source upgrade to higher intensity and polarization. In this technique a proton beam inside the high magnetic field solenoid is produced by ionization of the atomic hydrogen beam (from external source) in the He-gas ionizer cell. Further proton polarization is produced in the process of polarized electron capture from the optically-pumped Rb vapour. The use of high-brightness primary beam and large cross-sections of charge-exchange cross-sections resulted in production of high intensity H- ion beam of 85% polarization. High beam brightness and polarization resulted in 75% polarization at 23 GeV out of AGS and 60-65% beam polarization at 100-250 GeV colliding beams in RHIC. The status of un-polarized magnetron type (Cs-vapour loaded) BNL source is also discussed.

Ion energies in high power impulse magnetron sputtering with and without localized ionization zones

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yang, Yuchen; Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720; Tanaka, Koichi

2015-03-23

High speed imaging of high power impulse magnetron sputtering discharges has revealed that ionization is localized in moving ionization zones but localization disappears at high currents for high yield targets. This offers an opportunity to study the effect ionization zones have on ion energies. We measure that ions have generally higher energies when ionization zones are present, supporting the concept that these zones are associated with moving potential humps. We propose that the disappearance of ionization zones is caused by an increased supply of atoms from the target which cools electrons and reduces depletion of atoms to be ionized.

Ion mass spectrometry investigations of the discharge during reactive high power pulsed and direct current magnetron sputtering of carbon in Ar and Ar/N{sub 2}

DOE Office of Scientific and Technical Information (OSTI.GOV)

Schmidt, S.; Greczynski, G.; Jensen, J.

2012-07-01

Ion mass spectrometry was used to investigate discharges formed during high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) of a graphite target in Ar and Ar/N{sub 2} ambient. Ion energy distribution functions (IEDFs) were recorded in time-averaged and time-resolved mode for Ar{sup +}, C{sup +}, N{sub 2}{sup +}, N{sup +}, and C{sub x}N{sub y}{sup +} ions. An increase of N{sub 2} in the sputter gas (keeping the deposition pressure, pulse width, pulse frequency, and pulse energy constant) results for the HiPIMS discharge in a significant increase in C{sup +}, N{sup +}, and CN{sup +} ion energies.more » Ar{sup +}, N{sub 2}{sup +}, and C{sub 2}N{sup +} ion energies, in turn, did not considerably vary with the changes in working gas composition. The HiPIMS process showed higher ion energies and fluxes, particularly for C{sup +} ions, compared to DCMS. The time evolution of the plasma species was analyzed for HiPIMS and revealed the sequential arrival of working gas ions, ions ejected from the target, and later during the pulse-on time molecular ions, in particular CN{sup +} and C{sub 2}N{sup +}. The formation of fullerene-like structured CN{sub x} thin films for both modes of magnetron sputtering is explained by ion mass-spectrometry results and demonstrated by transmission electron microscopy as well as diffraction.« less

Ion source

DOEpatents

Leung, Ka-Ngo; Ehlers, Kenneth W.

1984-01-01

A magnetic filter for an ion source reduces the production of undesired ion species and improves the ion beam quality. High-energy ionizing electrons are confined by the magnetic filter to an ion source region, where the high-energy electrons ionize gas molecules. One embodiment of the magnetic filter uses permanent magnets oriented to establish a magnetic field transverse to the direction of travel of ions from the ion source region to the ion extraction region. In another embodiment, low energy 16 eV electrons are injected into the ion source to dissociate gas molecules and undesired ion species into desired ion species.

Plasma ``anti-assistance'' and ``self-assistance'' to high power impulse magnetron sputtering

NASA Astrophysics Data System (ADS)

Anders, André; Yushkov, Georgy Yu.

2009-04-01

A plasma assistance system was investigated with the goal to operate high power impulse magnetron sputtering (HiPIMS) at lower pressure than usual, thereby to enhance the utilization of the ballistic atoms and ions with high kinetic energy in the film growth process. Gas plasma flow from a constricted plasma source was aimed at the magnetron target. Contrary to initial expectations, such plasma assistance turned out to be contraproductive because it led to the extinction of the magnetron discharge. The effect can be explained by gas rarefaction. A better method of reducing the necessary gas pressure is operation at relatively high pulse repetition rates where the afterglow plasma of one pulse assists in the development of the next pulse. Here we show that this method, known from medium-frequency (MF) pulsed sputtering, is also very important at the much lower pulse repetition rates of HiPIMS. A minimum in the possible operational pressure is found in the frequency region between HiPIMS and MF pulsed sputtering.

Localized traveling ionization zones and their importance for the high power impulse magnetron sputtering process

NASA Astrophysics Data System (ADS)

Maszl, Christian

2016-09-01

High power impulse magnetron sputtering (HiPIMS) is a technique to deposit thin films with superior quality. A high ionization degree up to 90% and the natural occurence of high energetic metal ions are the reason why HiPIMS exceeds direct current magnetron sputtering in terms of coating quality. On the other hand HiPIMS suffers from a reduced efficiency, especially if metal films are produced. Therefore, a lot of research is done by experimentalists and theoreticians to clarify the transport mechanisms from target to substrate and to identify the energy source of the energetic metal ions. Magnetron plasmas are prone to a wide range of wave phenomena and instabilities. Especially, during HiPIMS at elevated power/current densities, symmetry breaks and self-organization in the plasma torus are observed. In this scenario localized travelling ionization zones with certain quasi-mode numbers are present which are commonly referred to as spokes. Because of their high rotation speed compared to typical process times of minutes their importance for thin film deposition was underestimated at first. Recent investigations show that spokes have a strong impact on particle transport, are probably the source of the high energetic metal ions and are therefore the essence of HiPIMS plasmas. In this contribution we will describe the current understanding of spokes, discuss implications for thin film synthesis and highlight open questions. This project is supported by the DFG (German Science Foundation) within the framework of the Coordinated Research Center SFB-TR 87 and the Research Department ``Plasmas with Complex Interactions'' at Ruhr-University Bochum.

ION SOURCE

DOEpatents

Martina, E.F.

1958-04-22

An improved ion source particularly adapted to provide an intense beam of ions with minimum neutral molecule egress from the source is described. The ion source structure includes means for establishing an oscillating electron discharge, including an apertured cathode at one end of the discharge. The egress of ions from the source is in a pencil like beam. This desirable form of withdrawal of the ions from the plasma created by the discharge is achieved by shaping the field at the aperture of the cathode. A tubular insulator is extended into the plasma from the aperture and in cooperation with the electric fields at the cathode end of the discharge focuses the ions from the source,

Improved ion source

DOEpatents

Leung, K.N.; Ehlers, K.W.

1982-05-04

A magnetic filter for an ion source reduces the production of undesired ion species and improves the ion beam quality. High-energy ionizing electrons are confined by the magnetic filter to an ion source region, where the high-energy electrons ionize gas molecules. One embodiment of the magnetic filter uses permanent magnets oriented to establish a magnetic field transverse to the direction of travel of ions from the ion source region to the ion extraction region. In another embodiment, low energy 16 eV electrons are injected into the ion source to dissociate gas molecules and undesired ion species into desired ion species,

Ion Sources

NASA Astrophysics Data System (ADS)

Haseroth, Helmut; Hora, Heinrich

1993-03-01

Ion sources for accelerators are based on plasma configurations with an extraction system in order to gain a very high number of ions within an appropriately short pulse and of sufficiently high charge number Z for advanced research. Beginning with the duoplasmatron, all established ion sources are based on low-density plasmas, of which the electron beam ionization source (EBIS) and the electron cyclotron resonance (ECR) source are the most advanced; for example they result in pulses of nearly 6 × 108 fully stripped sulfur ions per pulse in the Super Proton Synchrotron (SPS) at CERN with energies of 200 GeV/u. As an example of a forthcoming development, we are reporting about the lead ion source for the same purpose. Contrary to these cases of low-density plasmas, where a rather long time is always necessary to generate sufficiently high charge states, the laser ion source uses very high density plasmas and therefore produced, for example in 1983, single shots of Au51+ ions of high directivity with energies above 300 MeV within 2 ns irradiation time of a gold target with a medium-to-large CO2 laser. Experiments at Dubna and Moscow, using small-size lasers, produced up to one million shots with 1 Hz sequence. After acceleration by a linac or otherwise, ion pulses of up to nearly 5 × 1010 ions of C4+ or Mg12+ with energies in the synchrotrons of up to 2 GeV/u were produced. The physics of the laser generation of the ions is most complex, as we know from laser fusion studies, including non-linear dynamic and dielectric effects, resonances, self-focusing, instabilities, double layers, and an irregular pulsation in the 20 ps range. This explains not only what difficulties are implied with the laser ion source, but also why it opens up a new direction of ion sources.

High-current electron gun with a planar magnetron integrated with an explosive-emission cathode

NASA Astrophysics Data System (ADS)

Kiziridi, P. P.; Ozur, G. E.

2017-05-01

A new high-current electron gun with plasma anode and explosive-emission cathode integrated with planar pulsed powered magnetron is described. Five hundred twelve copper wires 1 mm in diameter and 15 mm in height serve as emitters. These emitters are installed on stainless steel disc (substrate) with 3-mm distance between them. Magnetron discharge plasma provides increased ion density on the periphery of plasma anode formed by high-current Penning discharge ignited within several milliseconds after starting of the magnetron discharge. The increased on the periphery ion density improves the uniformity of high-current electron beam produced in such an electron gun.

Change Spectrum Characteristics Modification of Films Deposited by Magnetron Sputtering with the Assistance of Argon Ions Beam

NASA Astrophysics Data System (ADS)

Umnov, S.; Asainov, O.

2015-04-01

Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.

Magnetron magnetic priming for rapid startup and noise reduction

NASA Astrophysics Data System (ADS)

Neculaes, Vasile Bogdan

The magnetron is a vacuum electronics crossed-field device: perpendicular electric and magnetic fields determine the electron dynamics. Compactness, efficiency and reliability make magnetrons suitable for a wide range of military and civilian applications: radar, industrial heating, plasma sources, and medical accelerators. The most ubiquitous use of magnetrons is as the microwave power source in microwave ovens, operating at 2.45 GHz and delivering about 800--1000 W. University of Michigan and several other research programs are actively pursuing the development of GW range relativistic magnetrons. This dissertation presents experimental and computational results concerning innovative techniques to improve magnetron noise, startup and mode stability. The DC-operated oven magnetron studies performed at University of Michigan opened new directions by utilizing azimuthally varying magnetic fields (magnetic priming). Magnetic priming for rapid startup in an N-cavity magnetron operating in the pi-mode is based on implementation of an axial magnetic field with N/2 azimuthal periods, to prebunch the electrons in the desired number of spokes (N/2). Experiments with magnetic priming on DC oven magnetrons using perturbing magnets added on the upper existing magnet of the magnetron showed rapid startup (pi-mode oscillation observed at low currents) and up to 35 dB noise reduction (close to the carrier and in sidebands). A complex 3-dimensional (3D) ICEPIC computational model recovered the oven magnetron magnetic priming experimental results: rapid electron prebunching due to presence of perturbing magnets, fast startup and tendency towards a lower noise state. Simulations in 6-cavity relativistic magnetrons show that ideal magnetic priming causes fast startup, rapid mode growth (with radial electron diffusion) and suppression of mode competition. A highly idealized model (planar, crossed-field, non-resonant, non-relativistic structure) using single particle dynamics showed

Magnetron sputtering for the production of EUV mask blanks

NASA Astrophysics Data System (ADS)

Kearney, Patrick; Ngai, Tat; Karumuri, Anil; Yum, Jung; Lee, Hojune; Gilmer, David; Vo, Tuan; Goodwin, Frank

2015-03-01

Ion Beam Deposition (IBD) has been the primary technique used to deposit EUV mask blanks since 1995 when it was discovered it could produce multilayers with few defects. Since that time the IBD technique has been extensively studied and improved and is finally approaching usable defectivities. But in the intervening years, the defectivity of magnetron sputtering has been greatly improved. This paper evaluates the suitability of a modern magnetron tool to produce EUV mask blanks and the ability to support HVM production. In particular we show that the reflectivity and uniformity of these tools are superior to current generation IBD tools, and that the magnetron tools can produce EUV films with defect densities comparable to recent best IBD tool performance. Magnetron tools also offer many advantages in manufacturability and tool throughput; however, challenges remain, including transitioning the magnetron tools from the wafer to mask formats. While work continues on quantifying the capability of magnetron sputtering to meet the mask blank demands of the industry, for the most part the remaining challenges do not require any fundamental improvements to existing technology. Based on the recent results and the data presented in this paper there is a clear indication that magnetron deposition should be considered for the future of EUV mask blank production.

TOPICAL REVIEW: Physics and phenomena in pulsed magnetrons: an overview

NASA Astrophysics Data System (ADS)

Bradley, J. W.; Welzel, T.

2009-05-01

This paper reviews the contribution made to the observation and understanding of the basic physical processes occurring in an important type of magnetized low-pressure plasma discharge, the pulsed magnetron. In industry, these plasma sources are operated typically in reactive mode where a cathode is sputtered in the presence of both chemically reactive and noble gases typically with the power modulated in the mid-frequency (5-350 kHz) range. In this review, we concentrate mostly, however, on physics-based studies carried out on magnetron systems operated in argon. This simplifies the physical-chemical processes occurring and makes interpretation of the observations somewhat easier. Since their first recorded use in 1993 there have been more than 300 peer-reviewed paper publications concerned with pulsed magnetrons, dealing wholly or in part with fundamental observations and basic studies. The fundamentals of these plasmas and the relationship between the plasma parameters and thin film quality regularly have whole sessions at international conferences devoted to them; however, since many different types of magnetron geometries have been used worldwide with different operating parameters the important results are often difficult to tease out. For example, we find the detailed observations of the plasma parameter (particle density and temperature) evolution from experiment to experiment are at best difficult to compare and at worst contradictory. We review in turn five major areas of studies which are addressed in the literature and try to draw out the major results. These areas are: fast electron generation, bulk plasma heating, short and long-term plasma parameter rise and decay rates, plasma potential modulation and transient phenomena. The influence of these phenomena on the ion energy and ion energy flux at the substrate is discussed. This review, although not exhaustive, will serve as a useful guide for more in-depth investigations using the referenced

A Two-stage Injection-locked Magnetron for Accelerators with Superconducting Cavities

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kazakevich, Grigory; Flanagan, Gene; Johnson, Rolland

2012-05-01

A concept for a two-stage injection-locked CW magnetron intended to drive Superconducting Cavities (SC) for intensity-frontier accelerators has been proposed. The concept considers two magnetrons in which the output power differs by 15-20 dB and the lower power magnetron being frequency-locked from an external source locks the higher power magnetron. The injection-locked two-stage CW magnetron can be used as an RF power source for Fermilab's Project-X to feed separately each of the 1.3 GHz SC of the 8 GeV pulsed linac. We expect output/locking power ratio of about 30-40 dB assuming operation in a pulsed mode with pulse duration ofmore » ~ 8 ms and repetition rate of 10 Hz. The experimental setup of a two-stage magnetron utilising CW, S-band, 1 kW tubes operating at pulse duration of 1-10 ms, and the obtained results are presented and discussed in this paper.« less

Glow plasma trigger for electron cyclotron resonance ion sources.

PubMed

Vodopianov, A V; Golubev, S V; Izotov, I V; Nikolaev, A G; Oks, E M; Savkin, K P; Yushkov, G Yu

2010-02-01

Electron cyclotron resonance ion sources (ECRISs) are particularly useful for nuclear, atomic, and high energy physics, as unique high current generators of multicharged ion beams. Plasmas of gas discharges in an open magnetic trap heated by pulsed (100 micros and longer) high power (100 kW and higher) high-frequency (greater than 37.5 GHz) microwaves of gyrotrons is promising in the field of research in the development of electron cyclotron resonance sources for high charge state ion beams. Reaching high ion charge states requires a decrease in gas pressure in the magnetic trap, but this method leads to increases in time, in which the microwave discharge develops. The gas breakdown and microwave discharge duration becomes greater than or equal to the microwave pulse duration when the pressure is decreased. This makes reaching the critical plasma density initiate an electron cyclotron resonance (ECR) discharge during pulse of microwave gyrotron radiation with gas pressure lower than a certain threshold. In order to reduce losses of microwave power, it is necessary to shorten the time of development of the ECR discharge. For fast triggering of ECR discharge under low pressure in an ECRIS, we initially propose to fill the magnetic trap with the plasmas of auxiliary pulsed discharges in crossed ExB fields. The glow plasma trigger of ECR based on a Penning or magnetron discharge has made it possible not only to fill the trap with plasma with density of 10(12) cm(-3), required for a rapid increase in plasma density and finally for ECR discharge ignition, but also to initially heat the plasma electrons to T(e) approximately = 20 eV.

A novel injection-locked amplitude-modulated magnetron at 1497 MHz

DOE Office of Scientific and Technical Information (OSTI.GOV)

Neubauer, Michael; Wang, Haipeng

2015-12-15

Thomas Jefferson National Accelerator Facility (JLab) uses low efficiency klystrons in the CEBAF machine. In the older portion they operate at 30% efficiency with a tube mean time between failure (MTBF) of five to six years. A highly efficient source (>55-60%) must provide a high degree of backwards compatibility, both in size and voltage requirements, to replace the klystron presently used at JLab, while providing energy savings. Muons, Inc. is developing a highly reliable, highly efficient RF source based upon a novel injection-locked amplitude modulated (AM) magnetron with a lower total cost of ownership, >80% efficiency, and MTBF of sixmore » to seven years. The design of the RF source is based upon a single injection-locked magnetron system at 8 kW capable of operating up to 13 kW, using the magnetron magnetic field to achieve the AM required for backwards compatibility to compensate for microphonics and beam loads. A novel injection-locked 1497 MHz 8 kW AM magnetron with a trim magnetic coil was designed and its operation numerically simulated during the Phase I project. The low-level RF system to control the trim field and magnetron anode voltage was designed and modeled for operation at the modulation frequencies of the microphonics. A plan for constructing a prototype magnetron and control system was developed.« less

ION SOURCE

DOEpatents

Leland, W.T.

1960-01-01

The ion source described essentially eliminater the problem of deposits of nonconducting materials forming on parts of the ion source by certain corrosive gases. This problem is met by removing both filament and trap from the ion chamber, spacing them apart and outside the chamber end walls, placing a focusing cylinder about the filament tip to form a thin collimated electron stream, aligning the cylinder, slits in the walls, and trap so that the electron stream does not bombard any part in the source, and heating the trap, which is bombarded by electrons, to a temperature hotter than that in the ion chamber, so that the tendency to build up a deposit caused by electron bombardment is offset by the extra heating supplied only to the trap.

Adjustable ECR Ion Source Control System: Ion Source Hydrogen Positive Project

NASA Astrophysics Data System (ADS)

Arredondo, I.; Eguiraun, M.; Jugo, J.; Piso, D.; del Campo, M.; Poggi, T.; Varnasseri, S.; Feuchtwanger, J.; Bilbao, J.; Gonzalez, X.; Harper, G.; Muguira, L.; Miracoli, R.; Corres, J.; Belver, D.; Echevarria, P.; Garmendia, N.; Gonzalez, P.; Etxebarria, V.

2015-06-01

ISHP (Ion Source Hydrogen Positive) project consists of a highly versatile ECR type ion source. It has been built for several purposes, on the one hand, to serve as a workbench to test accelerator related technologies and validate in-house made developments, at the first stages. On the other hand, to design an ion source valid as the first step in an actual LINAC. Since this paper is focused on the control system of ISHP, besides the ion source, all the hardware and its control architecture is presented. Nowadays the ion source is able to generate a pulse of positive ions of Hydrogen from 2 μs to a few ms range with a repetition rate ranging from 1 Hz to 50 Hz with a maximum of 45 mA of current. Furthermore, the first experiments with White Rabbit (WR) synchronization system are presented.

PULSED ION SOURCE

DOEpatents

Martina, E.F.

1958-10-14

An improved pulsed ion source of the type where the gas to be ionized is released within the source by momentary heating of an electrode occluded with the gas is presented. The other details of the ion source construction include an electron emitting filament and a positive reference grid, between which an electron discharge is set up, and electrode means for withdrawing the ions from the source. Due to the location of the gas source behind the electrode discharge region, and the positioning of the vacuum exhaust system on the opposite side of the discharge, the released gas is drawn into the electron discharge and ionized in accurately controlled amounts. Consequently, the output pulses of the ion source may be accurately controlled.

PULSED ION SOURCE

DOEpatents

Ford, F.C.; Ruff, J.W.; Zizzo, S.G.; Cook, B.

1958-11-11

An ion source is described adapted for pulsed operation and producing copious quantities of ions with a particular ion egress geometry. The particular source construction comprises a conical member having a conducting surface formed of a metal with a gas occladed therein and narrow non-conducting portions hereon dividing the conducting surface. A high voltage pulse is applied across the conducting surface or producing a discharge across the surface. After the gas ions have been produced by the discharge, the ions are drawn from the source in a diverging conical beam by a specially constructed accelerating electrode.

Industrial ion source technology

NASA Technical Reports Server (NTRS)

Kaufman, H. R.

1976-01-01

A 30 cm electron bombardment ion source was designed and fabricated for micromachining and sputtering applications. This source has a multipole magnetic field that employs permanent magnets between permeable pole pieces. An average ion current density of 1 ma/sq cm with 500 eV argon ions was selected as a design operating condition. The ion beam at this operating condition was uniform and well collimated, with an average variation of plus or minus 5 percent over the center 20 cm of the beam at distances up to 30 cm from the ion source. A variety of sputtering applications were undertaken with a small 10 cm ion source to better understand the ion source requirements in these applications. The results of these experimental studies are also included.

Selective ion source

DOEpatents

Leung, K.N.

1996-05-14

A ion source is described wherein selected ions maybe extracted to the exclusion of unwanted ion species of higher ionization potential. Also described is a method of producing selected ions from a compound, such as P{sup +} from PH{sub 3}. The invention comprises a plasma chamber, an electron source, a means for introducing a gas to be ionized by electrons from the electron source, means for limiting electron energy from the electron source to a value between the ionization energy of the selected ion species and the greater ionization energy of an unwanted ion specie, and means for extracting the target ion specie from the plasma chamber. In one embodiment, the electrons are generated in a plasma cathode chamber immediately adjacent to the plasma chamber. A small extractor draws the electrons from the plasma cathode chamber into the relatively positive plasma chamber. The energy of the electrons extracted in this manner is easily controlled. The invention is particularly useful for doping silicon with P{sup +}, As{sup +}, and B{sup +} without the problematic presence of hydrogen, helium, water, or carbon oxide ions. Doped silicon is important for manufacture of semiconductors and semiconductor devices. 6 figs.

Selective ion source

DOEpatents

Leung, Ka-Ngo

1996-01-01

A ion source is described wherein selected ions maybe extracted to the exclusion of unwanted ion species of higher ionization potential. Also described is a method of producing selected ions from a compound, such as P.sup.+ from PH.sub.3. The invention comprises a plasma chamber, an electron source, a means for introducing a gas to be ionized by electrons from the electron source, means for limiting electron energy from the electron source to a value between the ionization energy of the selected ion species and the greater ionization energy of an unwanted ion specie, and means for extracting the target ion specie from the plasma chamber. In one embodiment, the electrons are generated in a plasma cathode chamber immediately adjacent to the plasma chamber. A small extractor draws the electrons from the plasma cathode chamber into the relatively positive plasma chamber. The energy of the electrons extracted in this manner is easily controlled. The invention is particularly useful for doping silicon with P.sup.+, AS.sup.+, and B.sup.+ without the problematic presence of hydrogen, helium, water, or carbon oxide ions. Doped silicon is important for manufacture of semiconductors and semiconductor devices.

RF priming of a long pulse relativistic magnetron

NASA Astrophysics Data System (ADS)

White, William Michael

Rapid startup, increased pulsewidth and mode locking of magnetrons have been demonstrated experimentally on a relativistic magnetron by radio frequency (RF) priming. Experiments utilize a -300 kV, 2-8 kA, 300-500 ns electron beam to drive a Titan 6-vane relativistic magnetron (˜100 MW output power). The RF priming source is a 100 kW pulsed magnetron operating at 1.27-1.32 GHz. Tuning stubs were utilized in the Titan structure to adjust the operating frequency of the relativistic magnetron pi-mode upward by 30%. The tuning was guided by simulation in the MAGIC 3D code and experimental cold tests including a mapping of the azimuthal electric field inside the relativistic magnetron structure. The most successful tuning geometry was that of a standard anode resonant structure, but RF priming experiments were performed on a rising-sun structure as well. The Time Frequency Analysis (TFA) program was used to directly observe the effects of RF priming on the relativistic magnetron. RF priming was successful in decreasing mode competition by suppressing the generation of the 2pi/3-mode power by 41%. RF priming experiments were also successful in increasing microwave pulsewidth by 12% and decreasing microwave output delay by 22%. These improvements were observed while operating in a priming regime not satisfying Adler's Relation. Overall, the improvements made to the performance of the relativistic magnetron were modest because of the low priming power available (50-250 kW).

A Multicusp Ion Source for Radioactive Ion Beams

NASA Astrophysics Data System (ADS)

Wutte, D.; Freedman, S.; Gough, R.; Lee, Y.; Leitner, M.; Leung, K. N.; Lyneis, C.; Picard, D. S.; Sun, L.; Williams, M. D.; Xie, Z. Q.

1997-05-01

In order to produce a radioactive ion beam of (14)O+, a 10-cm-diameter, 13.56 MHz radio frequency (rf) driven multicusp ion source is now being developed at Lawrence Berkeley National Laboratory. In this paper we describe the specific ion source design and the basic ion source characteristics using Ar, Xe and a 90types of measurements have been performed: extractable ion current, ion species distributions, gas efficiency, axial energy spread and ion beam emittance measurements. The source can generate ion current densities of approximately 60 mA/cm2 . In addition the design of the ion beam extraction/transport system for the actual experimental setup for the radioactive beam line will be presented.

ION SOURCE

DOEpatents

Blue, C.W.; Luce, J.S.

1960-07-19

An ion source is described and comprises an arc discharge parallel to the direction of and inside of a magnetic field. an accelerating electrode surrounding substantially all of the discharge except for ion exit apertures, and means for establishing an electric field between that electrode and the arc discharge. the electric field being oriented at an acute angle to the magnetic field. Ions are drawn through the exit apertures in the accelrating electrcde in a direction substantially divergent to the direction of the magnetic field and so will travel in a spiral orbit along the magnetic field such that the ions will not strike the source at any point in their orbit within the magnetic field.

Cathode Priming vs. RF Priming for Relativistic Magnetrons

NASA Astrophysics Data System (ADS)

White, W. M.; Spencer, T. A.; Price, D.

2005-10-01

Magnetron start-oscillation time, pulsewidth and pi-mode locking are experimentally compared for RF priming versus cathode priming on the Michigan-Titan relativistic magnetron (-300 kV, 2-10 kA, 300-500 ns). Cathode priming [1, 2] is an innovative technique first demonstrated experimentally at UM. In this technique, the cathode is fabricated with N/2 emitting strips or N/2-separate cathodes (for an N-cavity magnetron), which generate the desired number of spokes for pi-mode. Cathode priming yields 13% faster startup with more reproducible pi-mode oscillation. Radio Frequency (RF) priming is investigated as the baseline priming technique for magnetrons. The external priming source is a 100kW, 3μs pulsewidth magnetron on loan from AFRL. RF priming reduced startup delay by 15% and increased pulsewidth by 9%. [1] M.C. Jones, V.B. Neculaes, R.M. Gilgenbach, W.M. White, M.R. Lopez, Y.Y. Lau, T.A. Spencer, and D. Price, Rev. Sci. Inst., 75, 2976 (2004) [2] M.C. Jones, Doctoral Dissertation, University of Michigan, 2005

Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

NASA Astrophysics Data System (ADS)

Anders, André

2017-05-01

High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. By applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized. In contrast to conventional magnetron sputtering, HiPIMS is characterized by self-sputtering or repeated gas recycling for high and low sputter yield materials, respectively, and both for most intermediate materials. The dense plasma in front of the target has the dual function of sustaining the discharge and providing plasma-assistance to film growth, affecting the microstructure of growing films. Many technologically interesting thin films are compound films, which are composed of one or more metals and a reactive gas, most often oxygen or nitrogen. When reactive gas is added, non-trivial consequences arise for the system because the target may become "poisoned," i.e., a compound layer forms on the target surface affecting the sputtering yield and the yield of secondary electron emission and thereby all other parameters. It is emphasized that the target state depends not only on the reactive gas' partial pressure (balanced via gas flow and pumping) but also on the ion flux to the target, which can be controlled by pulse parameters. This is a critical technological opportunity for reactive HiPIMS (R-HiPIMS). The scope of this tutorial is focused on plasma processes and mechanisms of operation and only briefly touches upon film properties. It introduces R-HiPIMS in a systematic, step-by-step approach by covering sputtering, magnetron sputtering, reactive magnetron sputtering, pulsed reactive magnetron sputtering, HiPIMS, and finally R-HiPIMS. The tutorial is concluded by considering variations of R-HiPIMS known as modulated pulsed power magnetron sputtering and deep-oscillation magnetron sputtering and combinations of R-HiPIMS with superimposed dc magnetron sputtering.

Reconstruction of the static magnetic field of a magnetron

NASA Astrophysics Data System (ADS)

Krüger, Dennis; Köhn, Kevin; Gallian, Sara; Brinkmann, Ralf Peter

2018-06-01

The simulation of magnetron discharges requires a quantitatively correct mathematical model of the magnetic field structure. This study presents a method to construct such a model on the basis of a spatially restricted set of experimental data and a plausible a priori assumption on the magnetic field configuration. The example in focus is that of a planar circular magnetron. The experimental data are Hall probe measurements of the magnetic flux density in an accessible region above the magnetron plane [P. D. Machura et al., Plasma Sources Sci. Technol. 23, 065043 (2014)]. The a priori assumption reflects the actual design of the device, and it takes the magnetic field emerging from a center magnet of strength m C and vertical position d C and a ring magnet of strength m R , vertical position d R , and radius R. An analytical representation of the assumed field configuration can be formulated in terms of generalized hypergeometric functions. Fitting the ansatz to the experimental data with a least square method results in a fully specified analytical field model that agrees well with the data inside the accessible region and, moreover, is physically plausible in the regions outside of it. The outcome proves superior to the result of an alternative approach which starts from a multimode solution of the vacuum field problem formulated in terms of polar Bessel functions and vertical exponentials. As a first application of the obtained field model, typical electron and ion Larmor radii and the gradient and curvature drift velocities of the electron guiding center are calculated.

Microwave ion source

DOEpatents

Leung, Ka-Ngo; Reijonen, Jani; Thomae, Rainer W.

2005-07-26

A compact microwave ion source has a permanent magnet dipole field, a microwave launcher, and an extractor parallel to the source axis. The dipole field is in the form of a ring. The microwaves are launched from the middle of the dipole ring using a coaxial waveguide. Electrons are heated using ECR in the magnetic field. The ions are extracted from the side of the source from the middle of the dipole perpendicular to the source axis. The plasma density can be increased by boosting the microwave ion source by the addition of an RF antenna. Higher charge states can be achieved by increasing the microwave frequency. A xenon source with a magnetic pinch can be used to produce intense EUV radiation.

Laser ion source for high brightness heavy ion beam

DOE PAGES

Okamura, M.

2016-09-01

A laser ion source is known as a high current high charge state heavy ion source. But, we place great emphasis on the capability to realize a high brightness ion source. A laser ion source has a pinpoint small volume where materials are ionized and can achieve quite uniform low temperature ion beam. Those features may enable us to realize very small emittance beams. Furthermore, a low charge state high brightness laser ion source was successfully commissioned in Brookhaven National Laboratory in 2014. Now most of all the solid based heavy ions are being provided from the laser ion sourcemore » for regular operation.« less

Effects of nitrogen ion implantation time on tungsten films deposited by DC magnetron sputtering on AISI 410 martensitic stainless steel

DOE Office of Scientific and Technical Information (OSTI.GOV)

Malau, Viktor, E-mail: malau@ugm.ac.id; Ilman, Mochammad Noer, E-mail: noer-ilman@yahoo.com; Iswanto, Priyo Tri, E-mail: priyatri@yahoo.com

Nitrogen ion implantation time on tungsten thin film deposited on surface of AISI 410 steel has been performed. Tungsten thin film produced by dc magnetron sputtering method was deposited on AISI 410 martensitic stainless steel substrates, and then the nitrogen ions were implanted on tungsten thin film. The objective of this research is to investigate the effects of implantation deposition time on surface roughness, microhardness, specific wear and corrosion rate of nitrogen implanted on tungsten film. Magnetron sputtering process was performed by using plasma gas of argon (Ar) to bombardier tungsten target (W) in a vacuum chamber with a pressuremore » of 7.6 x 10{sup −2} torr, a voltage of 300 V, a sputter current of 80 mA for sputtered time of 10 minutes. Nitrogen implantation on tungsten film was done with an initial pressure of 3x10{sup −6} mbar, a fluence of 2 x 10{sup 17} ions/cm{sup 2}, an energy of 100 keV and implantation deposition times of 0, 20, 30 and 40 minutes. The surface roughness, microhardness, specific wear and corrosion rate of the films were evaluated by surfcorder test, Vickers microhardness test, wear test and potentiostat (galvanostat) test respectively. The results show that the nitrogen ions implanted deposition time on tungsten film can modify the surface roughness, microhardness, specific wear and corrosion rate. The minimum surface roughness, specific wear and corrosion rate can be obtained for implantation time of 20 minutes and the maximum microhardness of the film is 329 VHN (Vickers Hardness Number) for implantation time of 30 minutes. The specific wear and corrosion rate of the film depend directly on the surface roughness.« less

Improved Magnetron Stability and Reduced Noise in Efficient Transmitters for Superconducting Accelerators

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kazakevich, G.; Johnson, R.; Lebedev, V.

State of the art high-current superconducting accelerators require efficient RF sources with a fast dynamic phase and power control. This allows for compensation of the phase and amplitude deviations of the accelerating voltage in the Superconducting RF (SRF) cavities caused by microphonics, etc. Efficient magnetron transmitters with fast phase and power control are attractive RF sources for this application. They are more cost effective than traditional RF sources such as klystrons, IOTs and solid-state amplifiers used with large scale accelerator projects. However, unlike traditional RF sources, controlled magnetrons operate as forced oscillators. Study of the impact of the controlling signalmore » on magnetron stability, noise and efficiency is therefore important. This paper discusses experiments with 2.45 GHz, 1 kW tubes and verifies our analytical model which is based on the charge drift approximation.« less

Methods of Phase and Power Control in Magnetron Transmitters for Superconducting Accelerators

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kazadevich, G.; Johnson, R.; Neubauer, M.

Various methods of phase and power control in magnetron RF sources of superconducting accelerators intended for ADS-class projects were recently developed and studied with conventional 2.45 GHz, 1 kW, CW magnetrons operating in pulsed and CW regimes. Magnetron transmitters excited by a resonant (injection-locking) phasemodulated signal can provide phase and power control with the rates required for precise stabilization of phase and amplitude of the accelerating field in Superconducting RF (SRF) cavities of the intensity-frontier accelerators. An innovative technique that can significantly increase the magnetron transmitter efficiency at the widerange power control required for superconducting accelerators was developed and verifiedmore » with the 2.45 GHz magnetrons operating in CW and pulsed regimes. High efficiency magnetron transmitters of this type can significantly reduce the capital and operation costs of the ADSclass accelerator projects.« less

Laser ion source with solenoid for Brookhaven National Laboratory-electron beam ion source.

PubMed

Kondo, K; Yamamoto, T; Sekine, M; Okamura, M

2012-02-01

The electron beam ion source (EBIS) preinjector at Brookhaven National Laboratory (BNL) is a new heavy ion-preinjector for relativistic heavy ion collider (RHIC) and NASA Space Radiation Laboratory (NSRL). Laser ion source (LIS) is a primary ion source provider for the BNL-EBIS. LIS with solenoid at the plasma drift section can realize the low peak current (∼100 μA) with high charge (∼10 nC) which is the BNL-EBIS requirement. The gap between two solenoids does not cause serious plasma current decay, which helps us to make up the BNL-EBIS beamline.

Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

DOE Office of Scientific and Technical Information (OSTI.GOV)

Anders, André

High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. Furthermore, by applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized. In contrast to conventional magnetron sputtering, HiPIMS is characterized by self-sputtering or repeated gas recycling for high and low sputter yield materials, respectively, and both for most intermediate materials. The dense plasma in front of the target has the dual function of sustaining the discharge and providing plasma-assistance to film growth, affecting the microstructure of growing films.more » Many technologically interesting thin films are compound films, which are composed of one or more metals and a reactive gas, most often oxygen or nitrogen. When reactive gas is added, non-trivial consequences arise for the system because the target may become “poisoned,” i.e., a compound layer forms on the target surface affecting the sputtering yield and the yield of secondary electron emission and thereby all other parameters. It is emphasized that the target state depends not only on the reactive gas' partial pressure (balanced via gas flow and pumping) but also on the ion flux to the target, which can be controlled by pulse parameters. This is a critical technological opportunity for reactive HiPIMS (R-HiPIMS). The scope of this tutorial is focused on plasma processes and mechanisms of operation and only briefly touches upon film properties. It introduces R-HiPIMS in a systematic, step-by-step approach by covering sputtering, magnetron sputtering, reactive magnetron sputtering, pulsed reactive magnetron sputtering, HiPIMS, and finally R-HiPIMS. The tutorial is concluded by considering variations of R-HiPIMS known as modulated pulsed power magnetron sputtering and deep-oscillation magnetron sputtering and combinations of R-HiPIMS with superimposed dc magnetron

Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

DOE PAGES

Anders, André

2017-03-21

High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. Furthermore, by applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized. In contrast to conventional magnetron sputtering, HiPIMS is characterized by self-sputtering or repeated gas recycling for high and low sputter yield materials, respectively, and both for most intermediate materials. The dense plasma in front of the target has the dual function of sustaining the discharge and providing plasma-assistance to film growth, affecting the microstructure of growing films.more » Many technologically interesting thin films are compound films, which are composed of one or more metals and a reactive gas, most often oxygen or nitrogen. When reactive gas is added, non-trivial consequences arise for the system because the target may become “poisoned,” i.e., a compound layer forms on the target surface affecting the sputtering yield and the yield of secondary electron emission and thereby all other parameters. It is emphasized that the target state depends not only on the reactive gas' partial pressure (balanced via gas flow and pumping) but also on the ion flux to the target, which can be controlled by pulse parameters. This is a critical technological opportunity for reactive HiPIMS (R-HiPIMS). The scope of this tutorial is focused on plasma processes and mechanisms of operation and only briefly touches upon film properties. It introduces R-HiPIMS in a systematic, step-by-step approach by covering sputtering, magnetron sputtering, reactive magnetron sputtering, pulsed reactive magnetron sputtering, HiPIMS, and finally R-HiPIMS. The tutorial is concluded by considering variations of R-HiPIMS known as modulated pulsed power magnetron sputtering and deep-oscillation magnetron sputtering and combinations of R-HiPIMS with superimposed dc magnetron

Tandem-Mirror Ion Source

NASA Technical Reports Server (NTRS)

Biddle, A.; Stone, N.; Reasoner, D.; Chisholm, W.; Reynolds, J.

1986-01-01

Improved ion source produces beam of ions at any kinetic energy from 1 to 1,000 eV, with little spread in energy or angle. Such ion beams useful in studies of surface properties of materials, surface etching, deposition, and development of plasma-diagnostic instrumentation. Tandemmirror ion source uses electrostatic and magnetic fields to keep electrons in ionization chamber and assure uniform output ion beam having low divergence in energy and angle.

A hollow cathode ion source for production of primary ions for the BNL electron beam ion source.

PubMed

Alessi, James; Beebe, Edward; Carlson, Charles; McCafferty, Daniel; Pikin, Alexander; Ritter, John

2014-02-01

A hollow cathode ion source, based on one developed at Saclay, has been modified significantly and used for several years to produce all primary 1+ ions injected into the Relativistic Heavy Ion Collider Electron Beam Ion Source (EBIS) at Brookhaven. Currents of tens to hundreds of microamperes have been produced for 1+ ions of He, C, O, Ne, Si, Ar, Ti, Fe, Cu, Kr, Xe, Ta, Au, and U. The source is very simple, relying on a glow discharge using a noble gas, between anode and a solid cathode containing the desired species. Ions of both the working gas and ionized sputtered cathode material are extracted, and then the desired species is selected using an ExB filter before being transported into the EBIS trap for charge breeding. The source operates pulsed with long life and excellent stability for most species. Reliable ignition of the discharge at low gas pressure is facilitated by the use of capacitive coupling from a simple toy plasma globe. The source design, and operating experience for the various species, is presented.

HIGH VOLTAGE ION SOURCE

DOEpatents

Luce, J.S.

1960-04-19

A device is described for providing a source of molecular ions having a large output current and with an accelerated energy of the order of 600 kv. Ions are produced in an ion source which is provided with a water-cooled source grid of metal to effect maximum recombination of atomic ions to molecular ions. A very high accelerating voltage is applied to withdraw and accelerate the molecular ions from the source, and means are provided for dumping the excess electrons at the lowest possible potentials. An accelerating grid is placed adjacent to the source grid and a slotted, grounded accelerating electrode is placed adjacent to the accelerating grid. A potential of about 35 kv is maintained between the source grid and accelerating grid, and a potential of about 600 kv is maintained between the accelerating grid and accelerating electrode. In order to keep at a minimum the large number of oscillating electrons which are created when such high voltages are employed in the vicinity of a strong magnetic field, a plurality of high voltage cascaded shields are employed with a conventional electron dumping system being employed between each shield so as to dump the electrons at the lowest possible potential rather than at 600 kv.

Simulation of the electric potential and plasma generation coupling in magnetron sputtering discharges

NASA Astrophysics Data System (ADS)

Trieschmann, Jan; Krueger, Dennis; Schmidt, Frederik; Brinkmann, Ralf Peter; Mussenbrock, Thomas

2016-09-01

Magnetron sputtering typically operated at low pressures below 1 Pa is a widely applied deposition technique. For both, high power impulse magnetron sputtering (HiPIMS) as well as direct current magnetron sputtering (dcMS) the phenomenon of rotating ionization zones (also referred to as spokes) has been observed. A distinct spatial profile of the electric potential has been associated with the latter, giving rise to low, mid, and high energy groups of ions observed at the substrate. The adherent question of which mechanism drives this process is still not fully understood. This query is approached using Monte Carlo simulations of the heavy particle (i.e., ions and neutrals) transport consistently coupled to a pre-specified electron density profile via the intrinsic electric field. The coupling between the plasma generation and the electric potential, which establishes correspondingly, is investigated. While the system is observed to strive towards quasi-neutrality, distinct mechanisms governing the shape of the electric potential profile are identified. This work is supported by the German Research Foundation (DFG) in the frame of the transregional collaborative research centre TRR 87.

Laser ion source for isobaric heavy ion collider experiment.

PubMed

Kanesue, T; Kumaki, M; Ikeda, S; Okamura, M

2016-02-01

Heavy-ion collider experiment in isobaric system is under investigation at Relativistic Heavy Ion Collider. For this experiment, ion source is required to maximize the abundance of the intended isotope. The candidate of the experiment is (96)Ru + (96)Zr. Since the natural abundance of particular isotope is low and composition of isotope from ion source depends on the composites of the target, an isotope enriched material may be needed as a target. We studied the performance of the laser ion source required for the experiment for Zr ions.

Liquid metal ion source assembly for external ion injection into an electron string ion source (ESIS)

DOE Office of Scientific and Technical Information (OSTI.GOV)

Segal, M. J., E-mail: mattiti@gmail.com; University of Cape Town, Rondebosch, Cape Town 7700; Bark, R. A.

An assembly for a commercial Ga{sup +} liquid metal ion source in combination with an ion transportation and focusing system, a pulse high-voltage quadrupole deflector, and a beam diagnostics system has been constructed in the framework of the iThemba LABS (Cape Town, South Africa)—JINR (Dubna, Russia) collaboration. First, results on Ga{sup +} ion beam commissioning will be presented. Outlook of further experiments for measurements of charge breeding efficiency in the electron string ion source with the use of external injection of Ga{sup +} and Au{sup +} ion beams will be reported as well.

Very-low-energy-spread ion sources

NASA Astrophysics Data System (ADS)

Lee, Y.

1997-05-01

Ion beams with low axial energy spread are required in many applications such as ion projection lithography, isobaric separation in radioactive ion beam experiments, and ion beam deposition processes. In an ion source, the spread of the axial ion energy is caused by the nonuniformity of the plasma potential distribution along the source axis. Multicusp ion sources are capable of production positive and negative ions with good beam quality and relatively low energy spread. By intorducing a magnetic filter inside the multicusp source chamber, the axial plasma potential distribution is modified and the energy spread of positive hydrogen ions can be reduced to as low as 1 eV. The energy spread measurements of multicusp sources have been conducted by employing three different techniques: an electrostatic energy analyzer at the source exit; a magnetic deflection spectrometer; and a retarding-field energy analyzer for the accelerated beam. These different measurements confirmed tha! t ! the axial energy spread of positive and negative ions generated in the filter-equipped multicusp sources are small. New ion source configurations are now being investigated at LBNL with the purpose of achieving enen lower energy spread (<1eV) and of maximizing source performance such as reliability and lifetime.

Ion sources for electric propulsion

NASA Technical Reports Server (NTRS)

Stuhlinger, E.

1971-01-01

Ion systems, which accelerate ions of Cs, Hg, or colloid particles by electrostatic fields, are furthest advanced and ready for application. Four kinds of ion sources have been developed: The contact ionization source for Cs as propellants, the electron bombardment source for Cs or Hg, the RF ionization source for Hg, and the hollow needle spray nozzle for colloidal glycerol particles. In each case, the ion beam must be neutralized by injection of electrons shortly behind the exit orifice to avoid adverse space charge effects.

CALUTRON ION SOURCE

DOEpatents

Lofgren, E.J.

1959-02-17

An improvement is described in ion source mechanisms whereby the source structure is better adapted to withstanid the ravages of heat, erosion, and deterioration concomitant with operation of an ion source of the calutron type. A pair of molybdenum plates define the exit opening of the arc chamber and are in thermal contact with the walls of the chamber. These plates are maintained at a reduced temperature by a pair of copper blocks in thermal conducting contact therewith to form subsequent diverging margins for the exit opening.

Very low pressure high power impulse triggered magnetron sputtering

DOEpatents

Anders, Andre; Andersson, Joakim

2013-10-29

A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.

Ion-source modeling and improved performance of the CAMS high-intensity Cs-sputter ion source

NASA Astrophysics Data System (ADS)

Brown, T. A.; Roberts, M. L.; Southon, J. R.

2000-10-01

The interior of the high-intensity Cs-sputter source used in routine operations at the Center for Accelerator Mass Spectrometry (CAMS) has been computer modeled using the program NEDLab, with the aim of improving negative ion output. Space charge effects on ion trajectories within the source were modeled through a successive iteration process involving the calculation of ion trajectories through Poisson-equation-determined electric fields, followed by calculation of modified electric fields incorporating the charge distribution from the previously calculated ion trajectories. The program has several additional features that are useful in ion source modeling: (1) averaging of space charge distributions over successive iterations to suppress instabilities, (2) Child's Law modeling of space charge limited ion emission from surfaces, and (3) emission of particular ion groups with a thermal energy distribution and at randomized angles. The results of the modeling effort indicated that significant modification of the interior geometry of the source would double Cs + ion production from our spherical ionizer and produce a significant increase in negative ion output from the source. The results of the implementation of the new geometry were found to be consistent with the model results.

CALUTRON ION SOURCE

DOEpatents

Oppenheimer, F.F.

1959-06-01

A shielding arrangement for eliminating oscillating electrons in the ion source region of calutrons is offered. Metal plates are attached to the ion generator so as to intercept the magnetic field between ion generator and accelerating electrode. The oscillating electrons are discharged on the plates. (T.R.H.)

Pulsed ion beam source

DOEpatents

Greenly, J.B.

1997-08-12

An improved pulsed ion beam source is disclosed having a new biasing circuit for the fast magnetic field. This circuit provides for an initial negative bias for the field created by the fast coils in the ion beam source which pre-ionize the gas in the source, ionize the gas and deliver the gas to the proper position in the accelerating gap between the anode and cathode assemblies in the ion beam source. The initial negative bias improves the interaction between the location of the nulls in the composite magnetic field in the ion beam source and the position of the gas for pre-ionization and ionization into the plasma as well as final positioning of the plasma in the accelerating gap. Improvements to the construction of the flux excluders in the anode assembly are also accomplished by fabricating them as layered structures with a high melting point, low conductivity material on the outsides with a high conductivity material in the center. 12 figs.

Pulsed ion beam source

DOEpatents

Greenly, John B.

1997-01-01

An improved pulsed ion beam source having a new biasing circuit for the fast magnetic field. This circuit provides for an initial negative bias for the field created by the fast coils in the ion beam source which pre-ionize the gas in the source, ionize the gas and deliver the gas to the proper position in the accelerating gap between the anode and cathode assemblies in the ion beam source. The initial negative bias improves the interaction between the location of the nulls in the composite magnetic field in the ion beam source and the position of the gas for pre-ionization and ionization into the plasma as well as final positioning of the plasma in the accelerating gap. Improvements to the construction of the flux excluders in the anode assembly are also accomplished by fabricating them as layered structures with a high melting point, low conductivity material on the outsides with a high conductivity material in the center.

ION SOURCE

DOEpatents

Bell, W.A. Jr.; Love, L.O.; Prater, W.K.

1958-01-28

An ion source is presented capable of producing ions of elements which vaporize only at exceedingly high temperatures, i.e.,--1500 degrees to 3000 deg C. The ion source utilizes beams of electrons focused into a first chamber housing the material to be ionized to heat the material and thereby cause it to vaporize. An adjacent second chamber receives the vaporized material through an interconnecting passage, and ionization of the vaporized material occurs in this chamber. The ionization action is produced by an arc discharge sustained between a second clectron emitting filament and the walls of the chamber which are at different potentials. The resultant ionized material egresses from a passageway in the second chamber. Using this device, materials which in the past could not be processed in mass spectometers may be satisfactorily ionized for such applications.

COASTING ARC ION SOURCE

DOEpatents

Foster, J.S. Jr.

1957-09-10

An improved ion source is described and in particular a source in which the ions are efficiently removed. The plasma is generated in a tubular amode structure by the oscillation of electrons in an axial magnetic field, as in the Phillips Ion Gage. The novel aspect of the source is the expansion of the plasma as it leaves the anode structure, so as to reduce the ion density at the axis of the anode and present a uniform area of plasma to an extraction grid. The structure utilized in the present patent to expand the plasma comprises flange members of high permeability at the exitgrid end of the amode to diverge the magnetic field adjacent the exit.

Ion-enhanced oxidation of aluminum as a fundamental surface process during target poisoning in reactive magnetron sputtering

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kuschel, Thomas; Keudell, Achim von

2010-05-15

Plasma deposition of aluminum oxide by reactive magnetron sputtering (RMS) using an aluminum target and argon and oxygen as working gases is an important technological process. The undesired oxidation of the target itself, however, causes the so-called target poisoning, which leads to strong hysteresis effects during RMS operation. The oxidation occurs by chemisorption of oxygen atoms and molecules with a simultaneous ion bombardment being present. This heterogenous surface reaction is studied in a quantified particle beam experiment employing beams of oxygen molecules and argon ions impinging onto an aluminum-coated quartz microbalance. The oxidation and/or sputtering rates are measured with thismore » microbalance and the resulting oxide layers are analyzed by x-ray photoelectron spectroscopy. The sticking coefficient of oxygen molecules is determined to 0.015 in the zero coverage limit. The sputtering yields of pure aluminum by argon ions are determined to 0.4, 0.62, and 0.8 at 200, 300, and 400 eV. The variation in the effective sticking coefficient and sputtering yield during the combined impact of argon ions and oxygen molecules is modeled with a set of rate equations. A good agreement is achieved if one postulates an ion-induced surface activation process, which facilitates oxygen chemisorption. This process may be identified with knock-on implantation of surface-bonded oxygen, with an electric-field-driven in-diffusion of oxygen or with an ion-enhanced surface activation process. Based on these fundamental processes, a robust set of balance equations is proposed to describe target poisoning effects in RMS.« less

Liquid metal ion source and alloy

DOEpatents

Clark, Jr., William M.; Utlaut, Mark W.; Behrens, Robert G.; Szklarz, Eugene G.; Storms, Edmund K.; Santandrea, Robert P.; Swanson, Lynwood W.

1988-10-04

A liquid metal ion source and alloy, wherein the species to be emitted from the ion source is contained in a congruently vaporizing alloy. In one embodiment, the liquid metal ion source acts as a source of arsenic, and in a source alloy the arsenic is combined with palladium, preferably in a liquid alloy having a range of compositions from about 24 to about 33 atomic percent arsenic. Such an alloy may be readily prepared by a combustion synthesis technique. Liquid metal ion sources thus prepared produce arsenic ions for implantation, have long lifetimes, and are highly stable in operation.

Method and apparatus for ion cyclotron spectrometry

DOEpatents

Dahl, David A [Idaho Falls, ID; Scott, Jill R [Idaho Falls, ID; McJunkin, Timothy R [Idaho Falls, ID

2010-08-17

An ion cyclotron spectrometer may include a vacuum chamber that extends at least along a z-axis and means for producing a magnetic field within the vacuum chamber so that a magnetic field vector is generally parallel to the z-axis. The ion cyclotron spectrometer may also include means for producing a trapping electric field within the vacuum chamber that includes at least a first section that induces a first magnetron effect that increases a cyclotron frequency of an ion and at least a second section that induces a second magnetron effect that decreases the cyclotron frequency of an ion. The cyclotron frequency changes induced by the first and second magnetron effects substantially cancel one another so that an ion traversing the at least first and second sections will experience no net change in cyclotron frequency.

Dusty waves and vortices in rf magnetron discharge plasma

NASA Astrophysics Data System (ADS)

Filippov, A. V.; Pal, A. F.; Ryabinkin, A. N.; Serov, A. O.; Shugaev, F. V.

2018-01-01

The appearance and subsequent growth of metallic particles in plasma of planar rf magnetron sputter were observed. The origin of the particles is sputtering of the rf electrode by ion flux from the plasma. In some regions of formed dust cloud the particles were involved in the horizontal or vertical circular movement. The horizontal rotation along the sputtered track in the cyclotron drift direction was observed close to the main magnetron plasma. The torus-shaped dust vortex ring engirdled the secondary plasma of the discharge at height of a few centimeters over the electrode. Close to this region particle density waves propagated through the cloud. The possible role of discharge plasma azimuthal inhomogeneity and gas dynamics effects in the forming the observed structures was considered.

Modulated electron cyclotron drift instability in a high-power pulsed magnetron discharge.

PubMed

Tsikata, Sedina; Minea, Tiberiu

2015-05-08

The electron cyclotron drift instability, implicated in electron heating and anomalous transport, is detected in the plasma of a planar magnetron. Electron density fluctuations associated with the mode are identified via an adapted coherent Thomson scattering diagnostic, under direct current and high-power pulsed magnetron operation. Time-resolved analysis of the mode amplitude reveals that the instability, found at MHz frequencies and millimeter scales, also exhibits a kHz-scale modulation consistent with the observation of larger-scale plasma density nonuniformities, such as the rotating spoke. Sharply collimated axial fluctuations observed at the magnetron axis are consistent with the presence of escaping electrons in a region where the magnetic and electric fields are antiparallel. These results distinguish aspects of magnetron physics from other plasma sources of similar geometry, such as the Hall thruster, and broaden the scope of instabilities which may be considered to dictate magnetron plasma features.

Improved Multiple-Species Cyclotron Ion Source

NASA Technical Reports Server (NTRS)

Soli, George A.; Nichols, Donald K.

1990-01-01

Use of pure isotope 86Kr instead of natural krypton in multiple-species ion source enables source to produce krypton ions separated from argon ions by tuning cylcotron with which source used. Addition of capability to produce and separate krypton ions at kinetic energies of 150 to 400 MeV necessary for simulation of worst-case ions occurring in outer space.

CALUTRON ION SOURCE

DOEpatents

Brobeck, W.M.

1959-02-24

An ion source is described wherein a portion of the filament serving as a cathode for the arc is protected from the effects of non-ionized particles escaping from the ionizing mechanism. In the described ion source, the source block has a gas chamber and a gas passage extending from said gas chamber to two adjacent faces of the source block. A plate overlies the passage and abuts one of the aforementioned block faces, while extending beyond the other face. In addition, the plate is apertured in line with the block passage. The filament overlies the aperture to effectively shield the portion of the filament not directiy aligned with the passage where the arc is produced.

Industrial ion source technology

NASA Technical Reports Server (NTRS)

Kaufman, H. R.; Robinson, R. S.

1979-01-01

In reactive ion etching of Si, varying amounts of O2 were added to the CF4 background. The experimental results indicated an etch rate less than that for Ar up to an O2 partial pressure of about .00006 Torr. Above this O2 pressure, the etch rate with CF4 exceeded that with Ar alone. For comparison the random arrival rate of O2 was approximately equal to the ion arrival rate at a partial pressure of about .00002 Torr. There were also ion source and ion pressure gauge maintenance problems as a result of the use of CF4. Large scale (4 sq cm) texturing of Si was accomplished using both Cu and stainless steel seed. The most effective seeding method for this texturing was to surround the sample with large inclined planes. Designing, fabricating, and testing a 200 sq cm rectangular beam ion source was emphasized. The design current density was 6 mA/sq cm with 500 eV argon ions, although power supply limitations permitted operation to only 2 mA/sq cm. The use of multiple rectangular beam ion sources for continuous processing of wider areas than would be possible with a single source was also studied. In all cases investigated, the most uniform coverage was obtained with 0 to 2 cm beam overlay. The maximum departure from uniform processing at optimum beam overlap was found to be +15%.

Laser ion source with solenoid field

NASA Astrophysics Data System (ADS)

Kanesue, Takeshi; Fuwa, Yasuhiro; Kondo, Kotaro; Okamura, Masahiro

2014-11-01

Pulse length extension of highly charged ion beam generated from a laser ion source is experimentally demonstrated. The laser ion source (LIS) has been recognized as one of the most powerful heavy ion source. However, it was difficult to provide long pulse beams. By applying a solenoid field (90 mT, 1 m) at plasma drifting section, a pulse length of carbon ion beam reached 3.2 μs which was 4.4 times longer than the width from a conventional LIS. The particle number of carbon ions accelerated by a radio frequency quadrupole linear accelerator was 1.2 × 1011, which was provided by a single 1 J Nd-YAG laser shot. A laser ion source with solenoid field could be used in a next generation heavy ion accelerator.

Design and simulation of ion optics for ion sources for production of singly charged ions

NASA Astrophysics Data System (ADS)

Zelenak, A.; Bogomolov, S. L.

2004-05-01

During the last 2 years different types of the singly charged ion sources were developed for FLNR (JINR) new projects such as Dubna radioactive ion beams, (Phase I and Phase II), the production of the tritium ion beam and the MASHA mass separator. The ion optics simulations for 2.45 GHz electron cyclotron resonance source, rf source, and the plasma ion source were performed. In this article the design and simulation results of the optics of new ion sources are presented. The results of simulation are compared with measurements obtained during the experiments.

A singly charged ion source for radioactive {sup 11}C ion acceleration

DOE Office of Scientific and Technical Information (OSTI.GOV)

Katagiri, K.; Noda, A.; Nagatsu, K.

2016-02-15

A new singly charged ion source using electron impact ionization has been developed to realize an isotope separation on-line system for simultaneous positron emission tomography imaging and heavy-ion cancer therapy using radioactive {sup 11}C ion beams. Low-energy electron beams are used in the electron impact ion source to produce singly charged ions. Ionization efficiency was calculated in order to decide the geometric parameters of the ion source and to determine the required electron emission current for obtaining high ionization efficiency. Based on these considerations, the singly charged ion source was designed and fabricated. In testing, the fabricated ion source wasmore » found to have favorable performance as a singly charged ion source.« less

Note: Ion source design for ion trap systems

NASA Astrophysics Data System (ADS)

Noriega, J. R.; Quevedo, M.; Gnade, B.; Vasselli, J.

2013-06-01

A small plasma (glow discharge) based ion source and circuit are described in this work. The ion source works by producing a high voltage pulsed discharge between two electrodes in a pressure range of 50-100 mTorr. A third mesh electrode is used for ion extraction. The electrodes are small stainless steel screws mounted in a MACOR ionization chamber in a linear arrangement. The electrode arrangement is driven by a circuit, design for low power operation. This design is a proof of concept intended for applications on small cylindrical ion traps.

PULSED ION SOURCE

DOEpatents

Anderson, C.E.; Ehlers, K.W.

1958-06-17

An ion source is described for producing very short high density pulses of ions without bcam scattering. The ions are created by an oscillating electron discharge within a magnetic field. After the ions are drawn from the ionization chamber by an accelerating electrode the ion beam is under the influence of the magnetic field for separation of the ions according to mass and, at the same time, passes between two neutralizing plntes maintained nt equal negative potentials. As the plates are formed of a material having a high ratio of secondary electrons to impinging ions, the ion bombardment of the plntes emits electrons which neutralize the frirge space-charge of the beam and tend to prevent widening of the beam cross section due to the mutual repulsion of the ions.

Laser ion source with solenoid field

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kanesue, Takeshi, E-mail: tkanesue@bnl.gov; Okamura, Masahiro; Fuwa, Yasuhiro

2014-11-10

Pulse length extension of highly charged ion beam generated from a laser ion source is experimentally demonstrated. The laser ion source (LIS) has been recognized as one of the most powerful heavy ion source. However, it was difficult to provide long pulse beams. By applying a solenoid field (90 mT, 1 m) at plasma drifting section, a pulse length of carbon ion beam reached 3.2 μs which was 4.4 times longer than the width from a conventional LIS. The particle number of carbon ions accelerated by a radio frequency quadrupole linear accelerator was 1.2 × 10{sup 11}, which was provided by a single 1 J Nd-YAGmore » laser shot. A laser ion source with solenoid field could be used in a next generation heavy ion accelerator.« less

Laser ion source with solenoid field

DOE PAGES

Kanesue, Takeshi; Fuwa, Yasuhiro; Kondo, Kotaro; ...

2014-11-12

Pulse length extension of highly charged ion beam generated from a laser ion source is experimentally demonstrated. In this study, the laser ion source (LIS) has been recognized as one of the most powerful heavy ion source. However, it was difficult to provide long pulse beams. By applying a solenoid field (90 mT, 1 m) at plasma drifting section, a pulse length of carbon ion beam reached 3.2 μs which was 4.4 times longer than the width from a conventional LIS. The particle number of carbon ions accelerated by a radio frequency quadrupole linear accelerator was 1.2 × 10 11,more » which was provided by a single 1 J Nd-YAG laser shot. A laser ion source with solenoid field could be used in a next generation heavy ion accelerator.« less

An ion source module for the Beijing Radioactive Ion-beam Facility

DOE Office of Scientific and Technical Information (OSTI.GOV)

Cui, B., E-mail: cui@ciae.ac.cn; Huang, Q.; Tang, B.

2014-02-15

An ion source module is developed for Beijing Radioactive Ion-beam Facility. The ion source module is designed to meet the requirements of remote handling. The connection and disconnection of the electricity, cooling and vacuum between the module and peripheral units can be executed without on-site manual work. The primary test of the target ion source has been carried out and a Li{sup +} beam has been extracted. Details of the ion source module and its primary test results are described.

Elementary surface processes during reactive magnetron sputtering of chromium

DOE Office of Scientific and Technical Information (OSTI.GOV)

Monje, Sascha; Corbella, Carles, E-mail: carles.corbella@rub.de; Keudell, Achim von

2015-10-07

The elementary surface processes occurring on chromium targets exposed to reactive plasmas have been mimicked in beam experiments by using quantified fluxes of Ar ions (400–800 eV) and oxygen atoms and molecules. For this, quartz crystal microbalances were previously coated with Cr thin films by means of high-power pulsed magnetron sputtering. The measured growth and etching rates were fitted by flux balance equations, which provided sputter yields of around 0.05 for the compound phase and a sticking coefficient of O{sub 2} of 0.38 on the bare Cr surface. Further fitted parameters were the oxygen implantation efficiency and the density of oxidationmore » sites at the surface. The increase in site density with a factor 4 at early phases of reactive sputtering is identified as a relevant mechanism of Cr oxidation. This ion-enhanced oxygen uptake can be attributed to Cr surface roughening and knock-on implantation of oxygen atoms deeper into the target. This work, besides providing fundamental data to control oxidation state of Cr targets, shows that the extended Berg's model constitutes a robust set of rate equations suitable to describe reactive magnetron sputtering of metals.« less

Silicon oxynitride films deposited by reactive high power impulse magnetron sputtering using nitrous oxide as a single-source precursor

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hänninen, Tuomas, E-mail: tuoha@ifm.liu.se; Schmidt, Susann; Jensen, Jens

2015-09-15

Silicon oxynitride thin films were synthesized by reactive high power impulse magnetron sputtering of silicon in argon/nitrous oxide plasmas. Nitrous oxide was employed as a single-source precursor supplying oxygen and nitrogen for the film growth. The films were characterized by elastic recoil detection analysis, x-ray photoelectron spectroscopy, x-ray diffraction, x-ray reflectivity, scanning electron microscopy, and spectroscopic ellipsometry. Results show that the films are silicon rich, amorphous, and exhibit a random chemical bonding structure. The optical properties with the refractive index and the extinction coefficient correlate with the film elemental composition, showing decreasing values with increasing film oxygen and nitrogen content.more » The total percentage of oxygen and nitrogen in the films is controlled by adjusting the gas flow ratio in the deposition processes. Furthermore, it is shown that the film oxygen-to-nitrogen ratio can be tailored by the high power impulse magnetron sputtering-specific parameters pulse frequency and energy per pulse.« less

Compact RF ion source for industrial electrostatic ion accelerator

NASA Astrophysics Data System (ADS)

Kwon, Hyeok-Jung; Park, Sae-Hoon; Kim, Dae-Il; Cho, Yong-Sub

2016-02-01

Korea Multi-purpose Accelerator Complex is developing a single-ended electrostatic ion accelerator to irradiate gaseous ions, such as hydrogen and nitrogen, on materials for industrial applications. ELV type high voltage power supply has been selected. Because of the limited space, electrical power, and robust operation, a 200 MHz RF ion source has been developed. In this paper, the accelerator system, test stand of the ion source, and its test results are described.

Compact RF ion source for industrial electrostatic ion accelerator.

PubMed

Kwon, Hyeok-Jung; Park, Sae-Hoon; Kim, Dae-Il; Cho, Yong-Sub

2016-02-01

Korea Multi-purpose Accelerator Complex is developing a single-ended electrostatic ion accelerator to irradiate gaseous ions, such as hydrogen and nitrogen, on materials for industrial applications. ELV type high voltage power supply has been selected. Because of the limited space, electrical power, and robust operation, a 200 MHz RF ion source has been developed. In this paper, the accelerator system, test stand of the ion source, and its test results are described.

PULSED ION SOURCE

DOEpatents

Kilpatrick, W.D.

1959-04-21

A source is presented for producing high intensity pulses of ions with precise time control of pulse initiation. The approach taken is to have one of the electrodes in the source occluded with the gas to be ionized. A trigger electrode is disposed adjacent to the gas filled electrode and is pulsed with a voltage to release the gas. The other structure of the source includes an apertured anode disposed between two cathodes, the gas filled electrode and another electrode. At the same time the gas is released a low voltage pulse is applied between the anode and cathodes to establish an ionizing arc discharge. An electrode adjacent to the arc withdraws the ions.

Structural and tribological properties of CrTiAlN coatings on Mg alloy by closed-field unbalanced magnetron sputtering ion plating

NASA Astrophysics Data System (ADS)

Shi, Yongjing; Long, Siyuan; Yang, Shicai; Pan, Fusheng

2008-09-01

In this paper, a series of multi-layer hard coating system of CrTiAlN has been prepared by closed-field unbalanced magnetron sputtering ion plating (CFUBMSIP) technique in a gas mixture of Ar + N 2. The coatings were deposited onto AZ31 Mg alloy substrates. During deposition step, technological temperature and metallic atom concentration of coatings were controlled by adjusting the currents of different metal magnetron targets. The nitrogen level was varied by using the feedback control of plasma optical emission monitor (OEM). The structural, mechanical and tribological properties of coatings were characterized by means of X-ray photoelectron spectrometry, high-resolution transmission electron microscope, field emission scanning electron microscope (FESEM), micro-hardness tester, and scratch and ball-on-disc tester. The experimental results show that the N atomic concentration increases and the oxide on the top of coatings decreases; furthermore the modulation period and the friction coefficient decrease with the N 2 level increasing. The outstanding mechanical property can be acquired at medium N 2 level, and the CrTiAlN coatings on AZ31 Mg alloy substrates outperform the uncoated M42 high speed steel (HSS) and the uncoated 316 stainless steel (SS).

ION SOURCE FOR CALUTRONS

DOEpatents

Tolmie, J.R.

1958-09-16

An improvement is presented in ion sources of the type employed in calutron devices. The described ion source has for its inventive contribution the incorporation of a plate-like cathode having the general configuration of a polygon including a given number of apices. When a polyphase source of current has a phase connected to each of the apices, the cathode is heated and rendered electron emissive. This particular cathode configuration is of sturdy construction and provides unuform emission over a considerable area.

DUHOCAMIS: a dual hollow cathode ion source for metal ion beams.

PubMed

Zhao, W J; Müller, M W O; Janik, J; Liu, K X; Ren, X T

2008-02-01

In this paper we describe a novel ion source named DUHOCAMIS for multiply charged metal ion beams. This ion source is derived from the hot cathode Penning ion gauge ion source (JINR, Dubna, 1957). A notable characteristic is the modified Penning geometry in the form of a hollow sputter electrode, coaxially positioned in a compact bottle-magnetic field along the central magnetic line of force. The interaction of the discharge geometry with the inhomogeneous but symmetrical magnetic field enables this device to be operated as hollow cathode discharge and Penning discharge as well. The main features of the ion source are the very high metal ion efficiency (up to 25%), good operational reproducibility, flexible and efficient operations for low charged as well as highly charged ions, compact setup, and easy maintenance. For light ions, e.g., up to titanium, well-collimated beams in the range of several tens of milliamperes of pulsed ion current (1 ms, 10/s) have been reliably performed in long time runs.

Structural and optical properties of DC magnetron sputtered ZnO films on glass substrate and their modification by Ag ions implantation

NASA Astrophysics Data System (ADS)

Ahmad, R.; Afzal, Naveed; Amjad, U.; Jabbar, S.; Hussain, T.; Hussnain, A.

2017-07-01

This work is focused on investigating the effects of deposition time and Ag ions implantation on structural and optical properties of ZnO film. The ZnO film was prepared on glass substrate by pulsed DC magnetron sputtering of pure Zn target in reactive oxygen environment for 2 h, 3 h, 4 h and 5 h respectively. X-ray diffraction results revealed polycrystalline ZnO film whose crystallinity was improved with increase of the deposition time. The morphological features indicated agglomeration of smaller grains into larger ones by increasing the deposition time. The UV-vis spectroscopy analysis depicted a small decrease in the band gap of ZnO from 3.36 eV to 3.27 eV with increase of deposition time. The Ag ions implantation in ZnO films deposited for 5 h on glass was carried out by using Pelletron Accelerator at different ions fluences ranging from 1  ×  1011 ions cm-2 to 2  ×  1012 ions cm-2. XRD patterns of Ag ions implanted ZnO did not show significant change in crystallite size by increasing ions fluence from 1  ×  1011 ions cm-2 to 5  ×  1011 ions cm-2. However, with further increase of the ions fluence, the crystallite size was decreased. The band gap of Ag ions implanted ZnO indicated anomalous variations with increase of the ions fluence.

Laser ion source for heavy ion inertial fusion

DOE Office of Scientific and Technical Information (OSTI.GOV)

Okamura, Masahiro

The proposed heavy ion inertial fusion (HIF) scenarios require ampere class low charge state ion beams of heavy species. A laser ion source (LIS) is recognized as one of the promising candidates of ion beam providers, since it can deliver high brightness heavy ion beams to accelerators. A design of LIS for the HIF depends on the accelerator structure and accelerator complex following the source. In this article, we discuss the specifications and design of an appropriate LIS assuming two major types of the accelerators: radio frequency (RF) high quality factor cavity type and non-resonant induction core type. We believemore » that a properly designed LIS satisfies the requirements of both types, however some issues need to be verified experimentally.« less

Laser ion source for heavy ion inertial fusion

DOE PAGES

Okamura, Masahiro

2018-01-10

The proposed heavy ion inertial fusion (HIF) scenarios require ampere class low charge state ion beams of heavy species. A laser ion source (LIS) is recognized as one of the promising candidates of ion beam providers, since it can deliver high brightness heavy ion beams to accelerators. A design of LIS for the HIF depends on the accelerator structure and accelerator complex following the source. In this article, we discuss the specifications and design of an appropriate LIS assuming two major types of the accelerators: radio frequency (RF) high quality factor cavity type and non-resonant induction core type. We believemore » that a properly designed LIS satisfies the requirements of both types, however some issues need to be verified experimentally.« less

Plasma-surface interaction in negative hydrogen ion sources

NASA Astrophysics Data System (ADS)

Wada, Motoi

2018-05-01

A negative hydrogen ion source delivers more beam current when Cs is introduced to the discharge, but a continuous operation of the source reduces the beam current until more Cs is added to the source. This behavior can be explained by adsorption and ion induced desorption of Cs atoms on the plasma grid surface of the ion source. The interaction between the ion source plasma and the plasma grid surface of a negative hydrogen ion source is discussed in correlation to the Cs consumption of the ion source. The results show that operation with deuterium instead of hydrogen should require more Cs consumption and the presence of medium mass impurities as well as ions of the source wall materials in the arc discharge enlarges the Cs removal rate during an ion source discharge.

Sample inlet tube for ion source

DOEpatents

Prior, David [Hermiston, OR; Price, John [Richland, WA; Bruce, Jim [Oceanside, CA

2002-09-24

An improved inlet tube is positioned within an aperture through the device to allow the passage of ions from the ion source, through the improved inlet tube, and into the interior of the device. The inlet tube is designed with a larger end and a smaller end wherein the larger end has a larger interior diameter than the interior diameter of the smaller end. The inlet tube is positioned within the aperture such that the larger end is pointed towards the ion source, to receive ions therefrom, and the smaller end is directed towards the interior of the device, to deliver the ions thereto. Preferably, the ion source utilized in the operation of the present invention is a standard electrospray ionization source. Similarly, the present invention finds particular utility in conjunction with analytical devices such as mass spectrometers.

Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbO x film growth

DOE PAGES

Franz, Robert; Clavero, César; Kolbeck, Jonathan; ...

2016-01-21

Here, the ion energies and fluxes in the high power impulse magnetron sputtering plasma from a Nb target were analysed angularly resolved along the tangential direction of the racetrack. A reactive oxygen-containing atmosphere was used as such discharge conditions are typically employed for the synthesis of thin films. Asymmetries in the flux distribution of the recorded ions as well as their energies and charge states were noticed when varying the angle between mass-energy analyser and target surface. More positively charged ions with higher count rates in the medium energy range of their distributions were detected in +E x B thanmore » in -E x B direction, thus confirming the notion that ionisation zones (also known as spokes or plasma bunches) are associated with moving potential humps. The motion of the recorded negatively charged high-energy oxygen ions was unaffected. NbO x thin films at different angles and positions were synthesised and analysed as to their structure and properties in order to correlate the observed plasma properties to the film growth conditions. The chemical composition and the film thickness varied with changing deposition angle, where the latter, similar to the ion fluxes, was higher in +E x B than in -E x B direction.« less

Design study of primary ion provider for relativistic heavy ion collider electron beam ion source.

PubMed

Kondo, K; Kanesue, T; Tamura, J; Okamura, M

2010-02-01

Brookhaven National Laboratory has developed the new preinjector system, electron beam ion source (EBIS) for relativistic heavy ion collider (RHIC) and National Aeronautics and Space Administration Space Radiation Laboratory. Design of primary ion provider is an essential problem since it is required to supply beams with different ion species to multiple users simultaneously. The laser ion source with a defocused laser can provide a low charge state and low emittance ion beam, and is a candidate for the primary ion source for RHIC-EBIS. We show a suitable design with appropriate drift length and solenoid, which helps to keep sufficient total charge number with longer pulse length. The whole design of primary ion source, as well as optics arrangement, solid targets configuration and heating about target, is presented.

Space-charge effects in Penning ion traps

NASA Astrophysics Data System (ADS)

Porobić, T.; Beck, M.; Breitenfeldt, M.; Couratin, C.; Finlay, P.; Knecht, A.; Fabian, X.; Friedag, P.; Fléchard, X.; Liénard, E.; Ban, G.; Zákoucký, D.; Soti, G.; Van Gorp, S.; Weinheimer, Ch.; Wursten, E.; Severijns, N.

2015-06-01

The influence of space-charge on ion cyclotron resonances and magnetron eigenfrequency in a gas-filled Penning ion trap has been investigated. Off-line measurements with K39+ using the cooling trap of the WITCH retardation spectrometer-based setup at ISOLDE/CERN were performed. Experimental ion cyclotron resonances were compared with ab initio Coulomb simulations and found to be in agreement. As an important systematic effect of the WITCH experiment, the magnetron eigenfrequency of the ion cloud was studied under increasing space-charge conditions. Finally, the helium buffer gas pressure in the Penning trap was determined by comparing experimental cooling rates with simulations.

Particle-in-Cell Modeling of Magnetron Sputtering Devices

NASA Astrophysics Data System (ADS)

Cary, John R.; Jenkins, T. G.; Crossette, N.; Stoltz, Peter H.; McGugan, J. M.

2017-10-01

In magnetron sputtering devices, ions arising from the interaction of magnetically trapped electrons with neutral background gas are accelerated via a negative voltage bias to strike a target cathode. Neutral atoms ejected from the target by such collisions then condense on neighboring material surfaces to form a thin coating of target material; a variety of industrial applications which require thin surface coatings are enabled by this plasma vapor deposition technique. In this poster we discuss efforts to simulate various magnetron sputtering devices using the Vorpal PIC code in 2D axisymmetric cylindrical geometry. Field solves are fully self-consistent, and discrete models for sputtering, secondary electron emission, and Monte Carlo collisions are included in the simulations. In addition, the simulated device can be coupled to an external feedback circuit. Erosion/deposition profiles and steady-state plasma parameters are obtained, and modifications due to self consistency are seen. Computational performance issues are also discussed. and Tech-X Corporation.

The modification at CSNS ion source

NASA Astrophysics Data System (ADS)

Liu, S.; Ouyang, H.; Huang, T.; Xiao, Y.; Cao, X.; Lv, Y.; Xue, K.; Chen, W.

2017-08-01

The commissioning of CSNS front end has been finished. Above 15 mA beam intensity is obtained at the end of RFQ. For CSNS ion source, it is a type of penning surface plasma ion source, similar to ISIS ion source. To improve the operation stability and reduce spark rate, some modifications have been performed, including Penning field, extraction optics and post acceleration. PBGUNS is applied to optimize beam extraction. The co-extraction electrons are considered at PBGUNS simulation and various extracted structure are simulated aiming to make the beam through the extracted electrode without loss. The stability of ion source is improved further.

Preliminary Tests of a Paul ion Trap as an Ion Source

NASA Astrophysics Data System (ADS)

Sadat Kiai, S. M.; Zirak, A. R.; Elahi, M.; Adlparvar, S.; Mortazavi, B. N.; Safarien, A.; Farhangi, S.; Sheibani, S.; Alhooie, S.; Khalaj, M. M. A.; Dabirzadeh, A. A.; Ruzbehani, M.; Zahedi, F.

2010-10-01

The paper reports on the design and construction of a Paul ion trap as an ion source by using an impact electron ionization technique. Ions are produced in the trap and confined for the specific time which is then extracted and detected by a Faraday cup. Especial electronic configurations are employed between the end caps, ring electrodes, electron gun and a negative voltage for the detector. This configuration allows a constant low level of pure ion source between the pulsed confined ion sources. The present experimental results are based on the production and confinement of Argon ions with good stability and repeatability, but in principle, the technique can be used for various Argon like ions.

The Pulsed Cylindrical Magnetron for Deposition

NASA Astrophysics Data System (ADS)

Korenev, Sergey

2012-10-01

The magnetron sputtering deposition of films and coatings broadly uses in microelectronics, material science, environmental applications and etc. The rate of target evaporation and time for deposition of films and coatings depends on magnetic field. These parameters link with efficiency of gas molecules ionization by electrons. The cylindrical magnetrons use for deposition of films and coatings on inside of pipes for different protective films and coatings in oil, chemical, environmental applications. The classical forming of magnetic field by permanent magnets or coils for big and long cylindrical magnetrons is complicated. The new concept of pulsed cylindrical magnetron for high rate deposition of films and coating for big and long pipes is presented in this paper. The proposed cylindrical magnetron has azimuthally pulsed high magnetic field, which allows forming the high ionized plasma and receiving high rate of evaporation material of target (central electrode). The structure of proposed pulsed cylindrical magnetron sputtering system is given. The main requirements to deposition system are presented. The preliminary data for forming of plasma and deposition of Ta films and coatings on the metal pipers are discussed. The comparison of classical and proposed cylindrical magnetrons is given. The analysis of potential applications is considered.

Electron beam ion source and electron beam ion trap (invited).

PubMed

Becker, Reinard; Kester, Oliver

2010-02-01

The electron beam ion source (EBIS) and its trap variant [electron beam ion trap (EBIT)] celebrated their 40th and 20th anniversary, respectively, at the EBIS/T Symposium 2007 in Heidelberg. These technologically challenging sources of highly charged ions have seen a broad development in many countries over the last decades. In contrast to most other ion sources the recipe of improvement was not "sorcery" but a clear understanding of the physical laws and obeying the technological constraints. This review will report important achievements of the past as well as promising developments in the future.

Inner Source Pickup Ions Observed by Ulysses

NASA Astrophysics Data System (ADS)

Gloeckler, G.

2016-12-01

The existence of an inner source of pickup ions close to the Sun was proposed in order to explain the unexpected discovery of C+ in the high-speed polar solar wind. Here I report on detailed analyses of the composition and the radial and latitudinal variations of inner source pickup ions measured with the Solar Wind Ion Composition Spectrometer on Ulysses from 1991 to 1998, approaching and during solar minimum. We find that the C+ intensity drops off with radial distance R as R-1.53, peaks at mid latitudes and drops to its lowest value in the ecliptic. Not only was C+ observed, but also N+, O+, Ne+, Na+, Mg+, Ar+, S+, K+, CH+, NH+, OH+, H2O+, H3O+, MgH+, HCN+, C2H4+, SO+ and many other singly-charged heavy ions and molecular ions. The measured velocity distributions of inner source pickup C+ and O+ indicate that these inner source pickup ions are most likely produced by charge exchange, photoionization and electron impact ionization of neutrals close to the Sun (within 10 to 30 solar radii). Possible causes for the unexpected latitudinal variations and the neutral source(s) producing the inner source pickup ions as well as plausible production mechanisms for inner source pickup ions will be discussed.

Multi-source ion funnel

DOEpatents

Tang, Keqi; Belov, Mikhail B.; Tolmachev, Aleksey V.; Udseth, Harold R.; Smith, Richard D.

2005-12-27

A method for introducing ions generated in a region of relatively high pressure into a region of relatively low pressure by providing at least two electrospray ion sources, providing at least two capillary inlets configured to direct ions generated by the electrospray sources into and through each of the capillary inlets, providing at least two sets of primary elements having apertures, each set of elements having a receiving end and an emitting end, the primary sets of elements configured to receive a ions from the capillary inlets at the receiving ends, and providing a secondary set of elements having apertures having a receiving end and an emitting end, the secondary set of elements configured to receive said ions from the emitting end of the primary sets of elements and emit said ions from said emitting end of the secondary set of elements. The method may further include the step of providing at least one jet disturber positioned within at least one of the sets of primary elements, providing a voltage, such as a dc voltage, in the jet disturber, thereby adjusting the transmission of ions through at least one of the sets of primary elements.

Polyatomic ions from a high current ion implanter driven by a liquid metal ion source.

PubMed

Pilz, W; Laufer, P; Tajmar, M; Böttger, R; Bischoff, L

2017-12-01

High current liquid metal ion sources are well known and found their first application as field emission electric propulsion thrusters in space technology. The aim of this work is the adaption of such kind of sources in broad ion beam technology. Surface patterning based on self-organized nano-structures on, e.g., semiconductor materials formed by heavy mono- or polyatomic ion irradiation from liquid metal (alloy) ion sources (LMAISs) is a very promising technique. LMAISs are nearly the only type of sources delivering polyatomic ions from about half of the periodic table elements. To overcome the lack of only very small treated areas by applying a focused ion beam equipped with such sources, the technology taken from space propulsion systems was transferred into a large single-end ion implanter. The main component is an ion beam injector based on high current LMAISs combined with suited ion optics allocating ion currents in the μA range in a nearly parallel beam of a few mm in diameter. Different types of LMAIS (needle, porous emitter, and capillary) are presented and characterized. The ion beam injector design is specified as well as the implementation of this module into a 200 kV high current ion implanter operating at the HZDR Ion Beam Center. Finally, the obtained results of large area surface modification of Ge using polyatomic Bi 2 + ions at room temperature from a GaBi capillary LMAIS will be presented and discussed.

Polyatomic ions from a high current ion implanter driven by a liquid metal ion source

NASA Astrophysics Data System (ADS)

Pilz, W.; Laufer, P.; Tajmar, M.; Böttger, R.; Bischoff, L.

2017-12-01

High current liquid metal ion sources are well known and found their first application as field emission electric propulsion thrusters in space technology. The aim of this work is the adaption of such kind of sources in broad ion beam technology. Surface patterning based on self-organized nano-structures on, e.g., semiconductor materials formed by heavy mono- or polyatomic ion irradiation from liquid metal (alloy) ion sources (LMAISs) is a very promising technique. LMAISs are nearly the only type of sources delivering polyatomic ions from about half of the periodic table elements. To overcome the lack of only very small treated areas by applying a focused ion beam equipped with such sources, the technology taken from space propulsion systems was transferred into a large single-end ion implanter. The main component is an ion beam injector based on high current LMAISs combined with suited ion optics allocating ion currents in the μA range in a nearly parallel beam of a few mm in diameter. Different types of LMAIS (needle, porous emitter, and capillary) are presented and characterized. The ion beam injector design is specified as well as the implementation of this module into a 200 kV high current ion implanter operating at the HZDR Ion Beam Center. Finally, the obtained results of large area surface modification of Ge using polyatomic Bi2+ ions at room temperature from a GaBi capillary LMAIS will be presented and discussed.

A vacuum spark ion source: High charge state metal ion beams

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yushkov, G. Yu., E-mail: gyushkov@mail.ru; Nikolaev, A. G.; Frolova, V. P.

2016-02-15

High ion charge state is often important in ion beam physics, among other reasons for the very practical purpose that it leads to proportionately higher ion beam energy for fixed accelerating voltage. The ion charge state of metal ion beams can be increased by replacing a vacuum arc ion source by a vacuum spark ion source. Since the voltage between anode and cathode remains high in a spark discharge compared to the vacuum arc, higher metal ion charge states are generated which can then be extracted as an ion beam. The use of a spark of pulse duration less thanmore » 10 μs and with current up to 10 kA allows the production of ion beams with current of several amperes at a pulse repetition rate of up to 5 pps. We have demonstrated the formation of high charge state heavy ions (bismuth) of up to 15 + and a mean ion charge state of more than 10 +. The physics and techniques of our vacuum spark ion source are described.« less

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

DOE PAGES

Anders, André

2014-09-02

In this study, high power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in thismore » review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.« less

Inductively generated streaming plasma ion source

DOEpatents

Glidden, Steven C.; Sanders, Howard D.; Greenly, John B.

2006-07-25

A novel pulsed, neutralized ion beam source is provided. The source uses pulsed inductive breakdown of neutral gas, and magnetic acceleration and control of the resulting plasma, to form a beam. The beam supplies ions for applications requiring excellent control of ion species, low remittance, high current density, and spatial uniformity.

Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Andersson, Joakim; Centre for Quantum Technologies, National University of Singapore, 3 Science Drive 2, 117543 Singapore; Ni, Pavel

Excitation and ionization conditions in traveling ionization zones of high power impulse magnetron sputtering plasmas were investigated using fast camera imaging through interference filters. The images, taken in end-on and side-on views using light of selected gas and target atom and ion spectral lines, suggest that ionization zones are regions of enhanced densities of electrons, and excited atoms and ions. Excited atoms and ions of the target material (Al) are strongly concentrated near the target surface. Images from the highest excitation energies exhibit the most localized regions, suggesting localized Ohmic heating consistent with double layer formation.

Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Centre for Quantum Technologies, National University of Singapore, 3 Science Drive 2, 117543 Singapore, Singapore; Andersson, Joakim; Ni, Pavel

Excitation and ionization conditions in traveling ionization zones of high power impulse magnetron sputtering plasmas were investigated using fast camera imaging through interference filters. The images, taken in end-on and side on views using light of selected gas and target atom and ion spectral lines, suggest that ionization zones are regions of enhanced densities of electrons, and excited atoms and ions. Excited atoms and ions of the target material (Al) are strongly concentrated near the target surface. Images from the highest excitation energies exhibit the most localized regions, suggesting localized Ohmic heating consistent with double layer formation.

An efficient magnetron transmitter for superconducting accelerators

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kazakevich, G.; Lebedev, V.; Yakovlev, V.

A concept of a highly-efficient high-power magnetron transmitter allowing wide-band phase and the mid-frequency power control at the frequency of the locking signal is proposed. The proposal is aimed for powering Superconducting RF (SRF) cavities of intensity-frontier accelerators. The transmitter is intended to operate with phase and amplitude control feedback loops allowing suppression of microphonics and beam loading in the SRF cavities. The concept utilizes injectionlocked magnetrons controlled in phase by the locking signal supplied by a feedback system. The injection-locking signal pre-excites the magnetron and allows its operation below the critical voltage. This realizes control of the magnetron powermore » in a wide range by control of the magnetron current. Pre-excitation of the magnetron by the locking signal provides an output power range up to 10 dB. Experimental studies were carried out with 2.45 GHz, 1 kW, CW magnetrons. They demonstrated stable operation of the magnetrons and power control at a low noise level. In conclusion, an analysis of the kinetics of the drifting charge in the drift approximation substantiates the concept and the experimental results.« less

An efficient magnetron transmitter for superconducting accelerators

DOE PAGES

Kazakevich, G.; Lebedev, V.; Yakovlev, V.; ...

2016-09-22

A concept of a highly-efficient high-power magnetron transmitter allowing wide-band phase and the mid-frequency power control at the frequency of the locking signal is proposed. The proposal is aimed for powering Superconducting RF (SRF) cavities of intensity-frontier accelerators. The transmitter is intended to operate with phase and amplitude control feedback loops allowing suppression of microphonics and beam loading in the SRF cavities. The concept utilizes injectionlocked magnetrons controlled in phase by the locking signal supplied by a feedback system. The injection-locking signal pre-excites the magnetron and allows its operation below the critical voltage. This realizes control of the magnetron powermore » in a wide range by control of the magnetron current. Pre-excitation of the magnetron by the locking signal provides an output power range up to 10 dB. Experimental studies were carried out with 2.45 GHz, 1 kW, CW magnetrons. They demonstrated stable operation of the magnetrons and power control at a low noise level. In conclusion, an analysis of the kinetics of the drifting charge in the drift approximation substantiates the concept and the experimental results.« less

Negative ion source with external RF antenna

DOEpatents

Leung, Ka-Ngo; Hahto, Sami K.; Hahto, Sari T.

2007-02-13

A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically formed of a small diameter metal tube coated with an insulator. An external RF antenna assembly is used to mount the external RF antenna to the ion source. The RF antenna tubing is wound around the external RF antenna assembly to form a coil. The external RF antenna assembly is formed of a material, e.g. quartz, which is essentially transparent to the RF waves. The external RF antenna assembly is attached to and forms a part of the plasma source chamber so that the RF waves emitted by the RF antenna enter into the inside of the plasma chamber and ionize a gas contained therein. The plasma ion source is typically a multi-cusp ion source. A converter can be included in the ion source to produce negative ions.

Radio frequency multicusp ion source development (invited)

NASA Astrophysics Data System (ADS)

Leung, K. N.

1996-03-01

The radio-frequency (rf) driven multicusp source was originally developed for use in the Superconducting Super Collider injector. It has been demonstrated that the source can meet the H- beam current and emittance requirements for this application. By employing a porcelain-coated antenna, a clean plasma discharge with very long-life operation can be achieved. Today, the rf source is used to generate both positive and negative hydrogen ion beams and has been tested in various particle accelerator laboratories throughout the world. Applications of this ion source have been extended to other fields such as ion beam lithography, oil-well logging, ion implantation, accelerator mass spectrometry and medical therapy machines. This paper summarizes the latest rf ion source technology and development at the Lawrence Berkeley National Laboratory.

Simulation study on ion extraction from electron cyclotron resonance ion sources

NASA Astrophysics Data System (ADS)

Fu, S.; Kitagawa, A.; Yamada, S.

1994-04-01

In order to study beam optics of NIRS-ECR ion source used in the HIMAC project, the EGUN code has been modified to make it capable of modeling ion extraction from a plasma. Two versions of the modified code are worked out with two different methods in which 1D and 2D sheath theories are used, respectively. Convergence problem of the strong nonlinear self-consistent equations is investigated. Simulations on NIRS-ECR ion source and HYPER-ECR ion source are presented in this paper, exhibiting an agreement with the experiment results.

Electron cyclotron resonance ion sources in use for heavy ion cancer therapy.

PubMed

Tinschert, K; Iannucci, R; Lang, R

2008-02-01

The use of electron cyclotron resonance (ECR) ion sources for producing ion beams for heavy ion cancer therapy has been established for more than ten years. After the Heavy Ion Medical Accelerator (HIMAC) at Chiba, Japan started therapy of patients with carbon ions in 1994 the first carbon ion beam for patient treatment at the accelerator facility of GSI was delivered in 1997. ECR ion sources are the perfect tool for providing the required ion beams with good stability, high reliability, and easy maintenance after long operating periods. Various investigations were performed at GSI with different combinations of working gas and auxiliary gas to define the optimal beam conditions for an extended use of further ion species for the dedicated Heidelberg Ion Beam Therapy (HIT) facility installed at the Radiological University Hospital Heidelberg, Germany. Commercially available compact all permanent magnet ECR ion sources operated at 14.5 GHz were chosen for this facility. Besides for (12)C(4+) these ion sources are used to provide beams of (1)H(3)(1+), (3)He(1+), and (16)O(6+). The final commissioning at the HIT facility could be finished at the end of 2006.

ION SOURCE UNIT FOR CALUTRON

DOEpatents

Sloan, D.H.; Yockey, H.P.; Schmidt, F.H.

1959-04-14

An improvement in the mounting arrangement for an ion source within the vacuum tank of a calutron device is reported. The cathode and arc block of the source are independently supported from a stem passing through the tank wall. The arc block may be pivoted and moved longitudinally with respect to the stem to thereby align the arc chamber in the biock with the cathode and magnetic field in the tank. With this arrangement the elements of the ion source are capable of precise adjustment with respect to one another, promoting increased source efficiency.

Magnetron with flux switching cathode and method of operation

DOEpatents

Aaron, David B.; Wiley, John D.

1989-01-01

A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness.

Structure of the metallic films deposited on small spheres trapped in the rf magnetron plasma

NASA Astrophysics Data System (ADS)

Filippov, A. V.; Pal, A. F.; Ryabinkin, A. N.; Serov, A. O.

2016-11-01

Metallic coatings were deposited onto glass spheres having diameters from several to one hundred micrometers by the magnetron sputtering. Two different experimental schemes were exploited. One of them had the traditional configuration where a magnetron sputter was placed at one hundred millimeters from particles. In this scheme, continuous mechanical agitation in a fluidized bed was used to achieve uniformity of coatings. In the second scheme the treated particles (substrates) levitated in a magnetron rf plasma over a sputtered rf electrode (target) at the distance d of few mm from it and at gas pressure p values of 30-100 mTorr. These parameters are essentially different from those in the traditional sputtering. Agitation due to the features of a particle confinement in dusty plasma was used here to obtain uniform coatings. Thickness and morphology of the obtained coatings were studied. As it is known, film growth rate and structure are determined by the substrate temperature, the densities of ion and neutral atom fluxes to the substrate surface, the radiation flux density, and the heat energy produced due to the surface condensation of atoms and recombination of electrons and ions. These parameters particularly depend on the product of p and d. In the case of magnetron rf dusty plasma, it is possible to achieve the pd value several times lower than the lowest value proper to the first traditional case. Completely different dependencies of the film growth rate and structure on the pd value in these sputtering processes were observed and qualitatively explained.

The negative hydrogen Penning ion gauge ion source for KIRAMS-13 cyclotron

DOE Office of Scientific and Technical Information (OSTI.GOV)

An, D. H.; Jung, I. S.; Kang, J.

2008-02-15

The cold-cathode-type Penning ion gauge (PIG) ion source for the internal ion source of KIRAMS-13 cyclotron has been used for generation of negative hydrogen ions. The dc H-beam current of 650 {mu}A from the PIG ion source with the Dee voltage of 40 kV and arc current of 1.0 A is extrapolated from the measured dc extraction beam currents at the low extraction dc voltages. The output optimization of PIG ion source in the cyclotron has been carried out by using various chimneys with different sizes of the expansion gap between the plasma boundary and the chimney wall. This papermore » presents the results of the dc H-extraction measurement and the expansion gap experiment.« less

Influence of nitrogen admixture to argon on the ion energy distribution in reactive high power pulsed magnetron sputtering of chromium

NASA Astrophysics Data System (ADS)

Breilmann, W.; Maszl, C.; Hecimovic, A.; von Keudell, A.

2017-04-01

Reactive high power impulse magnetron sputtering (HiPIMS) of metals is of paramount importance for the deposition of various oxides, nitrides and carbides. The addition of a reactive gas such as nitrogen to an argon HiPIMS plasma with a metal target allows the formation of the corresponding metal nitride on the substrate. The addition of a reactive gas introduces new dynamics into the plasma process, such as hysteresis, target poisoning and the rarefaction of two different plasma gases. We investigate the dynamics for the deposition of chromium nitride by a reactive HiPIMS plasma using energy- and time-resolved ion mass spectrometry, fast camera measurements and temporal and spatially resolved optical emission spectroscopy. It is shown that the addition of nitrogen to the argon plasma gas significantly changes the appearance of the localized ionization zones, the so-called spokes, in HiPIMS plasmas. In addition, a very strong modulation of the metal ion flux within each HiPIMS pulse is observed, with the metal ion flux being strongly suppressed and the nitrogen molecular ion flux being strongly enhanced in the high current phase of the pulse. This behavior is explained by a stronger return effect of the sputtered metal ions in the dense plasma above the racetrack. This is best observed in a pure nitrogen plasma, because the ionization zones are mostly confined, implying a very high local plasma density and consequently also an efficient scattering process.

Ion source with external RF antenna

DOEpatents

Leung, Ka-Ngo; Ji, Qing; Wilde, Stephen

2005-12-13

A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically formed of a small diameter metal tube coated with an insulator. An external RF antenna assembly is used to mount the external RF antenna to the ion source. The RF antenna tubing is wound around the external RF antenna assembly to form a coil. The external RF antenna assembly is formed of a material, e.g. quartz, which is essentially transparent to the RF waves. The external RF antenna assembly is attached to and forms a part of the plasma source chamber so that the RF waves emitted by the RF antenna enter into the inside of the plasma chamber and ionize a gas contained therein. The plasma ion source is typically a multi-cusp ion source.

RF synchronized short pulse laser ion source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Fuwa, Yasuhiro, E-mail: fuwa@kyticr.kuicr.kyoto-u.ac.jp; Iwashita, Yoshihisa; Tongu, Hiromu

A laser ion source that produces shortly bunched ion beam is proposed. In this ion source, ions are extracted immediately after the generation of laser plasma by an ultra-short pulse laser before its diffusion. The ions can be injected into radio frequency (RF) accelerating bucket of a subsequent accelerator. As a proof-of-principle experiment of the ion source, a RF resonator is prepared and H{sub 2} gas was ionized by a short pulse laser in the RF electric field in the resonator. As a result, bunched ions with 1.2 mA peak current and 5 ns pulse length were observed at themore » exit of RF resonator by a probe.« less

RF H-minus ion source development in China spallation neutron source

NASA Astrophysics Data System (ADS)

Chen, W.; Ouyang, H.; Xiao, Y.; Liu, S.; Lü, Y.; Cao, X.; Huang, T.; Xue, K.

2017-08-01

China Spallation Neutron Source (CSNS) phase-I project currently uses a Penning surface plasma H- ion source, which has a life time of several weeks with occasional sparks between high voltage electrodes. To extend the life time of the ion source and prepare for the CSNS phase-II, we are trying to develop a RF negative hydrogen ion source with external antenna. The configuration of the source is similar to the DESY external antenna ion source and SNS ion source. However several changes are made to improve the stability and the life time. Firstly, Si3N4 ceramic with high thermal shock resistance, and high thermal conductivity is used for plasma chamber, which can endure an average power of 2000W. Secondly, the water-cooled antenna is brazed on the chamber to improve the energy efficiency. Thirdly, cesium is injected directly to the plasma chamber if necessary, to simplify the design of the converter and the extraction. Area of stainless steel exposed to plasma is minimized to reduce the sputtering and degassing. Instead Mo, Ta, and Pt coated materials are used to face the plasma, which makes the self-cleaning of the source possible.

ECR ion source with electron gun

DOEpatents

Xie, Z.Q.; Lyneis, C.M.

1993-10-26

An Advanced Electron Cyclotron Resonance ion source having an electron gun for introducing electrons into the plasma chamber of the ion source is described. The ion source has a injection enclosure and a plasma chamber tank. The plasma chamber is defined by a plurality of longitudinal magnets. The electron gun injects electrons axially into the plasma chamber such that ionization within the plasma chamber occurs in the presence of the additional electrons produced by the electron gun. The electron gun has a cathode for emitting electrons therefrom which is heated by current supplied from an AC power supply while bias potential is provided by a bias power supply. A concentric inner conductor and outer conductor carry heating current to a carbon chuck and carbon pusher which hold the cathode in place and also heat the cathode. In the Advanced Electron Cyclotron Resonance ion source, the electron gun replaces the conventional first stage used in prior electron cyclotron resonance ion generators. 5 figures.

rf improvements for Spallation Neutron Source H- ion source.

PubMed

Kang, Y W; Fuja, R; Goulding, R H; Hardek, T; Lee, S-W; McCarthy, M P; Piller, M C; Shin, K; Stockli, M P; Welton, R F

2010-02-01

The Spallation Neutron Source at Oak Ridge National Laboratory is ramping up the accelerated proton beam power to 1.4 MW and just reached 1 MW. The rf-driven multicusp ion source that originates from the Lawrence Berkeley National Laboratory has been delivering approximately 38 mA H(-) beam in the linac at 60 Hz, 0.9 ms. To improve availability, a rf-driven external antenna multicusp ion source with a water-cooled ceramic aluminum nitride (AlN) plasma chamber is developed. Computer modeling and simulations have been made to analyze and optimize the rf performance of the new ion source. Operational statistics and test runs with up to 56 mA medium energy beam transport beam current identify the 2 MHz rf system as a limiting factor in the system availability and beam production. Plasma ignition system is under development by using a separate 13 MHz system. To improve the availability of the rf power system with easier maintenance, we tested a 70 kV isolation transformer for the 80 kW, 6% duty cycle 2 MHz amplifier to power the ion source from a grounded solid-state amplifier.

Charge exchange molecular ion source

DOEpatents

Vella, Michael C.

2003-06-03

Ions, particularly molecular ions with multiple dopant nucleons per ion, are produced by charge exchange. An ion source contains a minimum of two regions separated by a physical barrier and utilizes charge exchange to enhance production of a desired ion species. The essential elements are a plasma chamber for production of ions of a first species, a physical separator, and a charge transfer chamber where ions of the first species from the plasma chamber undergo charge exchange or transfer with the reactant atom or molecules to produce ions of a second species. Molecular ions may be produced which are useful for ion implantation.

Development of the ion source for cluster implantation

NASA Astrophysics Data System (ADS)

Kulevoy, T. V.; Seleznev, D. N.; Kozlov, A. V.; Kuibeda, R. P.; Kropachev, G. N.; Alexeyenko, O. V.; Dugin, S. N.; Oks, E. M.; Gushenets, V. I.; Hershcovitch, A.; Jonson, B.; Poole, H. J.

2014-02-01

Bernas ion source development to meet needs of 100s of electron-volt ion implanters for shallow junction production is in progress in Institute for Theoretical and Experimental Physics. The ion sources provides high intensity ion beam of boron clusters under self-cleaning operation mode. The last progress with ion source operation is presented. The mechanism of self-cleaning procedure is described.

Highly conductive ultrathin Co films by high-power impulse magnetron sputtering

NASA Astrophysics Data System (ADS)

Jablonka, L.; Riekehr, L.; Zhang, Z.; Zhang, S.-L.; Kubart, T.

2018-01-01

Ultrathin Co films deposited on SiO2 with conductivities exceeding that of Cu are demonstrated. Ionized deposition implemented by high-power impulse magnetron sputtering (HiPIMS) is shown to result in smooth films with large grains and low resistivities, namely, 14 µΩ cm at a thickness of 40 nm, which is close to the bulk value of Co. Even at a thickness of only 6 nm, a resistivity of 35 µΩ cm is obtained. The improved film quality is attributed to a higher nucleation density in the Co-ion dominated plasma in HiPIMS. In particular, the pulsed nature of the Co flux as well as shallow ion implantation of Co into SiO2 can increase the nucleation density. Adatom diffusion is further enhanced in the ionized process, resulting in a dense microstructure. These results are in contrast to Co deposited by conventional direct current magnetron sputtering where the conductivity is reduced due to smaller grains, voids, rougher interfaces, and Ar incorporation. The resistivity of the HiPIMS films is shown to be in accordance with models by Mayadas-Shatzkes and Sondheimer which consider grain-boundary and surface-scattering.

Experimental study on an S-band near-field microwave magnetron power transmission system on hundred-watt level

NASA Astrophysics Data System (ADS)

Zhang, Biao; Jiang, Wan; Yang, Yang; Yu, Chengyang; Huang, Kama; Liu, Changjun

2015-11-01

A multi-magnetron microwave source, a metamaterial transmitting antenna, and a large power rectenna array are presented to build a near-field 2.45 GHz microwave power transmission system. The square 1 m2 rectenna array consists of sixteen rectennas with 2048 Schottky diodes for large power microwave rectifying. It receives microwave power and converts them into DC power. The design, structure, and measured performance of a unit rectenna as well as the entail rectenna array are presented in detail. The multi-magnetron microwave power source switches between half and full output power levels, i.e. the half-wave and full-wave modes. The transmission antenna is formed by a double-layer metallic hole array, which is applied to combine the output power of each magnetron. The rectenna array DC output power reaches 67.3 W on a 1.2 Ω DC load at a distance of 5.5 m from the transmission antenna. DC output power is affected by the distance, DC load, and the mode of microwave power source. It shows that conventional low power Schottky diodes can be applied to a microwave power transmission system with simple magnetrons to realise large power microwave rectifying.

Versatile plasma ion source with an internal evaporator

NASA Astrophysics Data System (ADS)

Turek, M.; Prucnal, S.; Drozdziel, A.; Pyszniak, K.

2011-04-01

A novel construction of an ion source with an evaporator placed inside a plasma chamber is presented. The crucible is heated to high temperatures directly by arc discharge, which makes the ion source suitable for substances with high melting points. The compact ion source enables production of intense ion beams for wide spectrum of solid elements with typical separated beam currents of ˜100-150 μA for Al +, Mn +, As + (which corresponds to emission current densities of 15-25 mA/cm 2) for the extraction voltage of 25 kV. The ion source works for approximately 50-70 h at 100% duty cycle, which enables high ion dose implantation. The typical power consumption of the ion source is 350-400 W. The paper presents detailed experimental data (e.g. dependences of ion currents and anode voltages on discharge and filament currents and magnetic flux densities) for Cr, Fe, Al, As, Mn and In. The discussion is supported by results of Monte Carlo method based numerical simulation of ionisation in the ion source.

Liquid metal ion source and alloy for ion emission of multiple ionic species

DOEpatents

Clark, Jr., William M.; Utlaut, Mark W.; Wysocki, Joseph A.; Storms, Edmund K.; Szklarz, Eugene G.; Behrens, Robert G.; Swanson, Lynwood W.; Bell, Anthony E.

1987-06-02

A liquid metal ion source and alloy for the simultaneous ion evaporation of arsenic and boron, arsenic and phosphorus, or arsenic, boron and phosphorus. The ionic species to be evaporated are contained in palladium-arsenic-boron and palladium-arsenic-boron-phosphorus alloys. The ion source, including an emitter means such as a needle emitter and a source means such as U-shaped heater element, is preferably constructed of rhenium and tungsten, both of which are readily fabricated. The ion sources emit continuous beams of ions having sufficiently high currents of the desired species to be useful in ion implantation of semiconductor wafers for preparing integrated circuit devices. The sources are stable in operation, experience little corrosion during operation, and have long operating lifetimes.

ION SOURCE WITH SPACE CHARGE NEUTRALIZATION

DOEpatents

Flowers, J.W.; Luce, J.S.; Stirling, W.L.

1963-01-22

This patent relates to a space charge neutralized ion source in which a refluxing gas-fed arc discharge is provided between a cathode and a gas-fed anode to provide ions. An electron gun directs a controlled, monoenergetic electron beam through the discharge. A space charge neutralization is effected in the ion source and accelerating gap by oscillating low energy electrons, and a space charge neutralization of the source exit beam is effected by the monoenergetic electron beam beyond the source exit end. The neutralized beam may be accelerated to any desired energy at densities well above the limitation imposed by Langmuir-Child' s law. (AEC)

ION SOURCE FOR A CALUTRON

DOEpatents

Backus, J.G.

1957-12-24

This patent relates to ion sources and more particularly describes an ion source for a calutron which has the advantage of efficient production of an ion beam and long operation time without recharging. The source comprises an arc block provided with an arc chamber connected to a plurality of series-connected charge chambers and means for heating the charge within the chambers. A cathode is disposed at one end of the arc chamber and enclosed hy a vapor tight housing to protect the cathode. The arc discharge is set up between the cathode and the block due to a difference in potentials placed on these parts, and a magnetic field is aligned with the arc discharge. Cooling of the arc block is accomplished by passing coolant through a hollow stem secured at one end to the block and rotatably mounted at the other end through the wall of the calutron. The ions are removed through a slit in the arc chamber by accelerating electrodes.

Ion source design for industrial applications

NASA Technical Reports Server (NTRS)

Kaufman, H. R.; Robinson, R. S.

1981-01-01

The design of broad-beam industrial ion sources is described. The approach used emphasizes refractory metal cathodes and permanent-magnet multipole discharge chambers. Design procedures and sample calculations are given for the discharge chamber, ion optics, cathodes, and magnetic circuit. Hardware designs are included for the isolator, cathode supports, anode supports, pole-piece assembly, and ion-optics supports. There are other ways of designing most ion source components, but the designs presented are representative of current technology and adaptable to a wide range of configurations.

DUAL HEATED ION SOURCE STRUCTURE HAVING ARC SHIFTING MEANS

DOEpatents

Lawrence, E.O.

1959-04-14

An ion source is presented for calutrons, particularly an electrode arrangement for the ion generator of a calutron ion source. The ion source arc chamber is heated and an exit opening with thermally conductive plates defines the margins of the opening. These plates are electrically insulated from the body of the ion source and are connected to a suitable source of voltage to serve as electrodes for shaping the ion beam egressing from the arc chamber.

New Cs sputter ion source with polyatomic ion beams for secondary ion mass spectrometry applications

NASA Astrophysics Data System (ADS)

Belykh, S. F.; Palitsin, V. V.; Veryovkin, I. V.; Kovarsky, A. P.; Chang, R. J. H.; Adriaens, A.; Dowsett, M. G.; Adams, F.

2007-08-01

A simple design for a cesium sputter ion source compatible with vacuum and ion-optical systems as well as with electronics of the commercially available Cameca IMS-4f instrument is reported. This ion source has been tested with the cluster primary ions of Sin- and Cun-. Our experiments with surface characterization and depth profiling conducted to date demonstrate improvements of the analytical capabilities of the secondary ion mass spectrometry instrument due to the nonadditive enhancement of secondary ion emission and shorter ion ranges of polyatomic projectiles compared to atomic ones with the same impact energy.

Characterization of TiCN coatings deposited by magnetron sputter-ion plating process: RBS and GDOS complementary analyses

NASA Astrophysics Data System (ADS)

Freire, F. L., Jr.; Senna, L. F.; Achete, C. A.; Hirsch, T.

1998-03-01

Hard TiCN films were deposited by dc-magnetron sputter-ion plating technique onto high-speed carbon steel S-6-5-2 (M 2). For selected deposition conditions, TiCN films were also deposited onto Si substrates. A Ti target was sputtered in ArCH 4N 2 atmosphere. The argon flux (12 sccm) was fixed and corresponds to 90% of the total flux, whereas the N 2 flux ranged from 3% to 9% of the total flux. The total pressure in the chamber during film deposition was 8-9 × 10 -2Pa. The substrate bias, Vb, was between 0 and -140V and the substrate temperature, Ts, was 350°C. Film composition and depth profile of the elements were obtained by Rutherford backscattering spectrometry (RBS) and glow discharge optical spectroscopy (GDOS). Some limitations of both techniques in analysing TiCN films were presented. The effect of methane poisoing of the Ti target and how it influences the film composition was discussed.

Distribution of Fe atom density in a dc magnetron sputtering plasma source measured by laser-induced fluorescence imaging spectroscopy

NASA Astrophysics Data System (ADS)

Shibagaki, K.; Nafarizal, N.; Sasaki, K.; Toyoda, H.; Iwata, S.; Kato, T.; Tsunashima, S.; Sugai, H.

2003-10-01

Magnetron sputtering discharge is widely used as an efficient method for thin film fabrication. In order to achieve the optimized fabrication, understanding of the kinetics in plasmas is essential. In the present work, we measured the density distribution of sputtered Fe atoms using laser-induced fluorescence imaging spectroscopy. A dc magnetron plasma source with a Fe target was used. An area of 20 × 2 mm in front of the target was irradiated by a tunable laser beam having a planar shape. The picture of laser-induced fluorescence on the laser beam was taken using an ICCD camera. In this way, we obtained the two-dimensional image of the Fe atom density. As a result, it has been found that the Fe atom density observed at a distance of several centimeters from the target is higher than that adjacent to the target, when the Ar gas pressure was relatively high. It is suggested from this result that some gas-phase production processes of Fe atoms are available in the plasma. This work has been performed under the 21st Century COE Program by the Ministry of Education, Culture, Sports, Science and Technology in Japan.

Magnetron with flux switching cathode and method of operation

DOEpatents

Aaron, D.B.; Wiley, J.D.

1989-09-12

A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness. 5 figs.

Self-organization and self-limitation in high power impulse magnetron sputtering

DOE Office of Scientific and Technical Information (OSTI.GOV)

Anders, Andre

The plasma over the racetrack in high power impulse magnetron sputtering develops in traveling ionization zones. Power densities can locally reach 10{sup 9} W/m{sup 2}, which is much higher than usually reported. Ionization zones move because ions are 'evacuated' by the electric field, exposing neutrals to magnetically confined, drifting electrons. Drifting secondary electrons amplify ionization of the same ionization zone where the primary ions came from, while sputtered and outgassing atoms are supplied to the following zone(s). Strong density gradients parallel to the target disrupt electron confinement: a negative feedback mechanism that stabilizes ionization runaway.

Waveguide-Mode Terahertz Free Electron Lasers Driven by Magnetron-Based Microtrons

NASA Astrophysics Data System (ADS)

Jeong, Young Uk; Miginsky, Sergey; Gudkov, Boris; Lee, Kitae; Mun, Jungho; Shim, Gyu Il; Bae, Sangyoon; Kim, Hyun Woo; Jang, Kyu-Ha; Park, Sunjeong; Park, Seong Hee; Vinokurov, Nikolay

2016-04-01

We have developed small-sized terahertz free-electron lasers by using low-cost and compact microtrons combining with magnetrons as high-power RF sources. We could stabilize the bunch repetition rate by optimizing a modulator for the magnetron and by coupling the magnetron with an accelerating cavity in the microtron. By developing high-performance undulators and low-loss waveguide-mode resonators having small cross-sectional areas, we could strengthen the interaction between the electron beam and the THz wave inside the FEL resonators to achieve lasing even with low-current electron beams from the microtron. We used a parallel-plate waveguide in a planar electromagnet undulator for our first THz FEL. We try to reduce the size of the FEL resonator by combining a dielectric-coated circular waveguide and a variable-period helical undulator to realize a table-top THz FEL for applying it to the security inspection on airports.

Development of a compact ECR ion source for various ion production.

PubMed

Muramatsu, M; Hojo, S; Iwata, Y; Katagiri, K; Sakamoto, Y; Takahashi, N; Sasaki, N; Fukushima, K; Takahashi, K; Suzuki, T; Sasano, T; Uchida, T; Yoshida, Y; Hagino, S; Nishiokada, T; Kato, Y; Kitagawa, A

2016-02-01

There is a desire that a carbon-ion radiotherapy facility will produce various ion species for fundamental research. Although the present Kei2-type ion sources are dedicated for the carbon-ion production, a future ion source is expected that could provide: (1) carbon-ion production for medical use, (2) various ions with a charge-to-mass ratio of 1/3 for the existing Linac injector, and (3) low cost for modification. A prototype compact electron cyclotron resonance (ECR) ion source, named Kei3, based on the Kei series has been developed to correspond to the Kei2 type and to produce these various ions at the National Institute of Radiological Sciences (NIRS). The Kei3 has an outer diameter of 280 mm and a length of 1120 mm. The magnetic field is formed by the same permanent magnet as Kei2. The movable extraction electrode has been installed in order to optimize the beam extraction with various current densities. The gas-injection side of the vacuum chamber has enough space for an oven system. We measured dependence of microwave frequency, extraction voltage, and puller position. Charge state distributions of helium, carbon, nitrogen, oxygen, and neon were also measured.

An all permanent magnet electron cyclotron resonance ion source for heavy ion therapy.

PubMed

Cao, Yun; Li, Jia Qing; Sun, Liang Ting; Zhang, Xue Zhen; Feng, Yu Cheng; Wang, Hui; Ma, Bao Hua; Li, Xi Xia

2014-02-01

A high charge state all permanent Electron Cyclotron Resonance ion source, Lanzhou All Permanent ECR ion source no. 3-LAPECR3, has been successfully built at IMP in 2012, which will serve as the ion injector of the Heavy Ion Medical Machine (HIMM) project. As a commercial device, LAPECR3 features a compact structure, small size, and low cost. According to HIMM scenario more than 100 eμA of C(5+) ion beam should be extracted from the ion source, and the beam emittance better than 75 π*mm*mrad. In recent commissioning, about 120 eμA of C(5+) ion beam was got when work gas was CH4 while about 262 eμA of C(5+) ion beam was obtained when work gas was C2H2 gas. The design and construction of the ion source and its low-energy transportation beam line, and the preliminary commissioning results will be presented in detail in this paper.

4th Generation ECR Ion Sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lyneis, Claude M.; Leitner, D.; Todd, D.S.

2008-12-01

The concepts and technical challenges related to developing a 4th generation ECR ion source with an RF frequency greater than 40 GHz and magnetic confinement fields greater than twice Becr will be explored in this paper. Based on the semi-empirical frequency scaling of ECR plasma density with the square of operating frequency, there should be significant gains in performance over current 3rd generation ECR ion sources, which operate at RF frequencies between 20 and 30 GHz. While the 3rd generation ECR ion sources use NbTi superconducting solenoid and sextupole coils, the new sources will need to use different superconducting materialsmore » such as Nb3Sn to reach the required magnetic confinement, which scales linearly with RF frequency. Additional technical challenges include increased bremsstrahlung production, which may increase faster than the plasma density, bremsstrahlung heating of the cold mass and the availability of high power continuous wave microwave sources at these frequencies. With each generation of ECR ion sources, there are new challenges to be mastered, but the potential for higher performance and reduced cost of the associated accelerator continue to make this a promising avenue for development.« less

Cleaning techniques for intense ion beam sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Menge, P.R.; Cuneo, M.E.; Bailey, J.E.

Generation of high power lithium ion beams on the SABRE (1TW) and PBFA-X (20 TW) accelerators have been limited by the parallel acceleration of contaminant ions. during the beam pulse lithium is replaced by protons and carbon ions. This replacement is accompanied by rapid impedance decay of the diode. The contaminant hydrogen and carbon is believed to originate from impurity molecules on the surface and in the bulk of the lithium ion source and its substrate material. Cleaning techniques designed to remove hydrocarbons from the ion source have been employed with some success in test stand experiments and on SABRE.more » The test stand experiments have shown that a lithium fluoride (LiF) ion source film can accrue dozens of hydrocarbon monolayers on its surface while sitting in vacuum. Application of 13.5 MHz RF discharge cleaning with 90% Ar/10% O{sub 2} can significantly reduce the surface hydrocarbon layers on the LiF film. On SABRE, combinations of RF discharge cleaning, anode heating, layering gold between the source film (LiF) and its substrate, and cryogenic cathode cooling produced an increase by a factor of 1.5--2 in the quantity of high energy lithium in the ion beam. A corresponding decrease in protons and carbon ions was also observed. Cleaning experiments on PBFA-X are underway. New designs of contamination resistant films and Li ion sources are currently being investigated.« less

Ion source for high-precision mass spectrometry

DOEpatents

Todd, Peter J.; McKown, Henry S.; Smith, David H.

1984-01-01

The invention is directed to a method for increasing the precision of positive-ion relative abundance measurements conducted in a sector mass spectrometer having an ion source for directing a beam of positive ions onto a collimating slit. The method comprises incorporating in the source an electrostatic lens assembly for providing a positive-ion beam of circular cross section for collimation by the slit.

Recent Development of IMP LECR3 Ion Source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhang, Z.M.; Zhao, H.W.; Li, J.Y.

2005-03-15

18GHz microwave has been fed to the LECR3 ion source to produce intense highly charged ion beams although this ion source was designed for 14.5GHz. Then 1.1 emA Ar8+ and 325 e{mu}A Ar11+ were obtained at 18GHz. During the source running for atomic physics experiment, some higher charge state ion beams such as Ar17+ and Ar18+ were detected and have been validated by atomic physics method. Furthermore, a few special gases, e.g. SiH4 and SF6, were tested on LECR3 ion source to produce required ion beams to satisfy the requirements of atomic physics experiments.

Survey of ion plating sources

NASA Technical Reports Server (NTRS)

Spalvins, T.

1979-01-01

Ion plating is a plasma deposition technique where ions of the gas and the evaporant have a decisive role in the formation of a coating in terms of adherence, coherence, and morphological growth. The range of materials that can be ion plated is predominantly determined by the selection of the evaporation source. Based on the type of evaporation source, gaseous media and mode of transport, the following will be discussed: resistance, electron beam sputtering, reactive and ion beam evaporation. Ionization efficiencies and ion energies in the glow discharge determine the percentage of atoms which are ionized under typical ion plating conditions. The plating flux consists of a small number of energetic ions and a large number of energetic neutrals. The energy distribution ranges from thermal energies up to a maximum energy of the discharge. The various reaction mechanisms which contribute to the exceptionally strong adherence - formation of a graded substrate/coating interface are not fully understood, however the controlling factors are evaluated. The influence of process variables on the nucleation and growth characteristics are illustrated in terms of morphological changes which affect the mechanical and tribological properties of the coating.

Review on heavy ion radiotherapy facilities and related ion sources (invited)a)

NASA Astrophysics Data System (ADS)

Kitagawa, A.; Fujita, T.; Muramatsu, M.; Biri, S.; Drentje, A. G.

2010-02-01

Heavy ion radiotherapy awakens worldwide interest recently. The clinical results obtained by the Heavy Ion Medical Accelerator in Chiba at the National Institute of Radiological Sciences in Japan have clearly demonstrated the advantages of carbon ion radiotherapy. Presently, there are four facilities for heavy ion radiotherapy in operation, and several new facilities are under construction or being planned. The most common requests for ion sources are a long lifetime and good stability and reproducibility. Sufficient intensity has been achieved by electron cyclotron resonance ion sources at the present facilities.

ECR ion source with electron gun

DOEpatents

Xie, Zu Q.; Lyneis, Claude M.

1993-01-01

An Advanced Electron Cyclotron Resonance ion source (10) having an electron gun (52) for introducing electrons into the plasma chamber (18) of the ion source (10). The ion source (10) has a injection enclosure (12) and a plasma chamber tank (14). The plasma chamber (18) is defined by a plurality of longitudinal magnets (16). The electron gun (52) injects electrons axially into the plasma chamber (18) such that ionization within the plasma chamber (18) occurs in the presence of the additional electrons produced by the electron gun (52). The electron gun (52) has a cathode (116) for emitting electrons therefrom which is heated by current supplied from an AC power supply (96) while bias potential is provided by a bias power supply (118). A concentric inner conductor (60) and Outer conductor (62) carry heating current to a carbon chuck (104) and carbon pusher (114) Which hold the cathode (116) in place and also heat the cathode (16). In the Advanced Electron Cyclotron Resonance ion source (10), the electron gun (52) replaces the conventional first stage used in prior art electron cyclotron resonance ion generators.

Plasmatic ion source

NASA Astrophysics Data System (ADS)

Semenov, A. P.

1986-02-01

A plasmatic ion source was built in which the hollow cathode above the two discharge chamber cathodes is readily replaced upon depletion after 250 to 300 h. The emission outlet hole is restored to original size by replacement of the cathode insert, while gas is continuously admitted by means of a spring mechanism. The source operates in the Penning discharge mode, with argon as the working gas. The hollow cathode is 36 mm long and has an inside diameter of 4 mm. The other two cathodes serve as pole shoes of a toroidal ferrite magnet which produces a longitudinal magnet field of 0.1 T induction in the discharge chamber. All three cathodes are made of magnetic steel and are insulated from cylindrical copper anode by teflon spacers. Heat is dissipated by oil, which carries it away to a water cooled housing compartment. The source generates an ion emission current of 20 mA with a discharge current of 200 mA at a pull voltage of 20kV.

Recent Development of IMP ECR Ion Sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhao, H.W.; Zhang, Z.M.; Sun, L.T.

2005-03-15

Great efforts have been made to develop highly charged ECR ion sources for application of heavy ion accelerator and atomic physics research at IMP in the past few years. The latest development of ECR ion sources at IMP is briefly reviewed. Intense beams with high and intermediate charge states have been produced from IMP LECR3 by optimization of the ion source conditions including rf frequency extended up to 18GHz. 1.1 emA of Ar8+ and 325 e{mu} A of Ar11+ were produced. Dependence of beam emittance on those key parameters of ECR ion source, beam extraction and space charge compensation weremore » experimentally studied at LECR3. Furthermore, an advanced superconducting ECR ion source named SECRAL is being constructed. SECRAL is designed to operate at rf frequency 18-28GHz with axial mirror magnetic fields 3.6-4.0 Tesla at injection, 2.2 Tesla at extraction and sextupole field 2.0 Tesla at the wall. The superconducting magnet with sextupole and three solenoids was tested in a test-cryostat and 95% of designed fields were reached. Construction status and planed schedule of SECRAL are presented.« less

Application of ion thruster technology to a 30-cm multipole sputtering ion source

NASA Technical Reports Server (NTRS)

Robinson, R. S.; Kaufman, H. R.

1976-01-01

A 30-cm electron-bombardment ion source has been designed and fabricated for micromachining and sputtering applications. This source has a multipole magnetic field that employs permanent magnets between permeable pole pieces. An average ion current density of 1 ma/sq cm with 500-eV argon ions was selected as a design operating condition. The ion beam at this operating condition was uniform and well collimated, with an average variation of + or -5 percent over the center 20 cm of the beam at a distance up to 30 cm from the ion source.

Development of a compact ECR ion source for various ion production

DOE Office of Scientific and Technical Information (OSTI.GOV)

Muramatsu, M., E-mail: m-mura@nirs.go.jp; Hojo, S.; Iwata, Y.

2016-02-15

There is a desire that a carbon-ion radiotherapy facility will produce various ion species for fundamental research. Although the present Kei2-type ion sources are dedicated for the carbon-ion production, a future ion source is expected that could provide: (1) carbon-ion production for medical use, (2) various ions with a charge-to-mass ratio of 1/3 for the existing Linac injector, and (3) low cost for modification. A prototype compact electron cyclotron resonance (ECR) ion source, named Kei3, based on the Kei series has been developed to correspond to the Kei2 type and to produce these various ions at the National Institute ofmore » Radiological Sciences (NIRS). The Kei3 has an outer diameter of 280 mm and a length of 1120 mm. The magnetic field is formed by the same permanent magnet as Kei2. The movable extraction electrode has been installed in order to optimize the beam extraction with various current densities. The gas-injection side of the vacuum chamber has enough space for an oven system. We measured dependence of microwave frequency, extraction voltage, and puller position. Charge state distributions of helium, carbon, nitrogen, oxygen, and neon were also measured.« less

Ion source for high-precision mass spectrometry

DOEpatents

Todd, P.J.; McKown, H.S.; Smith, D.H.

1982-04-26

The invention is directed to a method for increasing the precision of positive-ion relative abundance measurements conducted in a sector mass spectrometer having an ion source for directing a beam of positive ions onto a collimating slit. The method comprises incorporating in the source an electrostatic lens assembly for providing a positive-ion beam of circular cross section for collimation by the slit. 2 figures, 3 tables.

An all permanent magnet electron cyclotron resonance ion source for heavy ion therapy

DOE Office of Scientific and Technical Information (OSTI.GOV)

Cao, Yun, E-mail: caoyun@impcas.ac.cn; Li, Jia Qing; Sun, Liang Ting

2014-02-15

A high charge state all permanent Electron Cyclotron Resonance ion source, Lanzhou All Permanent ECR ion source no. 3-LAPECR3, has been successfully built at IMP in 2012, which will serve as the ion injector of the Heavy Ion Medical Machine (HIMM) project. As a commercial device, LAPECR3 features a compact structure, small size, and low cost. According to HIMM scenario more than 100 eμA of C{sup 5+} ion beam should be extracted from the ion source, and the beam emittance better than 75 π*mm*mrad. In recent commissioning, about 120 eμA of C{sup 5+} ion beam was got when work gasmore » was CH{sub 4} while about 262 eμA of C{sup 5+} ion beam was obtained when work gas was C{sub 2}H{sub 2} gas. The design and construction of the ion source and its low-energy transportation beam line, and the preliminary commissioning results will be presented in detail in this paper.« less

Discharge current modes of high power impulse magnetron sputtering

DOE Office of Scientific and Technical Information (OSTI.GOV)

Wu, Zhongzhen, E-mail: wuzz@pkusz.edu.cn; Xiao, Shu; Ma, Zhengyong

2015-09-15

Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.

A high repetition deterministic single ion source

NASA Astrophysics Data System (ADS)

Sahin, C.; Geppert, P.; Müllers, A.; Ott, H.

2017-12-01

We report on a deterministic single ion source with high repetition rate and high fidelity. The source employs a magneto-optical trap, where ultracold rubidium atoms are photoionized. The electrons herald the creation of a corresponding ion, whose timing information is used to manipulate its trajectory in flight. We demonstrate an ion rate of up to 4× {10}4 {{{s}}}-1 and achieve a fidelity for single ion operation of 98%. The technique can be used for all atomic species, which can be laser-cooled, and opens up new applications in ion microscopy, ion implantation and surface spectroscopy.

An advanced negative hydrogen ion source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Goncharov, Alexey A., E-mail: gonchar@iop.kiev.ua; Dobrovolsky, Andrey N.; Goretskii, Victor P.

2016-02-15

The results of investigation of emission productivity of negative particles source with cesiated combined discharge are presented. A cylindrical beam of negative hydrogen ions with density about 2 A/cm{sup 2} in low noise mode on source emission aperture is obtained. The total beam current values are up to 200 mA for negative hydrogen ions and up to 1.5 A for all negative particles with high divergence after source. The source has simple design and can produce stable discharge with low level of oscillation.

Electron string ion sources for carbon ion cancer therapy accelerators

DOE Office of Scientific and Technical Information (OSTI.GOV)

Boytsov, A. Yu.; Donets, D. E.; Donets, E. D.

2015-08-15

The type of the Electron String Ion Sources (ESIS) is considered to be the appropriate one to produce pulsed C{sup 4+} and C{sup 6+} ion beams for cancer therapy accelerators. In fact, the new test ESIS Krion-6T already now provides more than 10{sup 10} C{sup 4+} ions per pulse and about 5 × 10{sup 9} C{sup 6+} ions per pulse. Such ion sources could be suitable to apply at synchrotrons. It has also been found that Krion-6T can provide more than 10{sup 11} C{sup 6+} ions per second at the 100 Hz repetition rate, and the repetition rate can bemore » increased at the same or larger ion output per second. This makes ESIS applicable at cyclotrons as well. ESIS can be also a suitable type of ion source to produce the {sup 11}C radioactive ion beams. A specialized cryogenic cell was experimentally tested at the Krion-2M ESIS for pulse injection of gaseous species into the electron string. It has been shown in experiments with stable methane that the total conversion efficiency of methane molecules to C{sup 4+} ions reached 5%÷10%. For cancer therapy with simultaneous irradiation and precise dose control (positron emission tomography) by means of {sup 11}C, transporting to the tumor with the primary accelerated {sup 11}C{sup 4+} beam, this efficiency is preliminarily considered to be large enough to produce the {sup 11}C{sup 4+} beam from radioactive methane and to inject this beam into synchrotrons.« less

Stability of Brillouin flow in planar, conventional, and inverted magnetrons

DOE Office of Scientific and Technical Information (OSTI.GOV)

Simon, D. H.; Lau, Y. Y.; Greening, G.

2015-08-15

The Brillouin flow is the prevalent flow in crossed-field devices. We systematically study its stability in the conventional, planar, and inverted magnetron geometry. To investigate the intrinsic negative mass effect in Brillouin flow, we consider electrostatic modes in a nonrelativistic, smooth bore magnetron. We found that the Brillouin flow in the inverted magnetron is more unstable than that in a planar magnetron, which in turn is more unstable than that in the conventional magnetron. Thus, oscillations in the inverted magnetron may startup faster than the conventional magnetron. This result is consistent with simulations, and with the negative mass property inmore » the inverted magnetron configuration. Inclusion of relativistic effects and electromagnetic effects does not qualitatively change these conclusions.« less

Li-ion diffusion kinetics in LiCoPO 4 thin films deposited on NASICON-type glass ceramic electrolytes by magnetron sputtering

NASA Astrophysics Data System (ADS)

Xie, J.; Imanishi, N.; Zhang, T.; Hirano, A.; Takeda, Y.; Yamamoto, O.

LiCoPO 4 thin films were deposited on Li 1+ x+ yAl xTi 2- xSi yP 3- yO 12 (LATSP) solid electrolyte by radio frequency magnetron sputtering and were characterized by X-ray diffraction and scanning electron microscope. The films show a (1 1 1) preferred orientation upon annealing and are chemically stable with LATSP up to 600 °C in air. An all-solid-state Li/PEO 18-Li(CF 3SO 2) 2N/LATSP/LiCoPO 4/Au cell was fabricated to investigate the electrochemical performance and Li-ion chemical diffusion coefficients, D˜Li , of the LiCoPO 4 thin films. The potential dependence of D˜Li values of the LiCoPO 4 thin film was investigated by potentiostatic intermittent titration technique and was compared with those of the LiFePO 4 thin film. These results showed that the intercalation mechanism of Li-ion in LiCoPO 4 is different from that in LiFePO 4.

A 1D ion species model for an RF driven negative ion source

NASA Astrophysics Data System (ADS)

Turner, I.; Holmes, A. J. T.

2017-08-01

A one-dimensional model for an RF driven negative ion source has been developed based on an inductive discharge. The RF source differs from traditional filament and arc ion sources because there are no primary electrons present, and is simply composed of an antenna region (driver) and a main plasma discharge region. However the model does still make use of the classical plasma transport equations for particle energy and flow, which have previously worked well for modelling DC driven sources. The model has been developed primarily to model the Small Negative Ion Facility (SNIF) ion source at CCFE, but may be easily adapted to model other RF sources. Currently the model considers the hydrogen ion species, and provides a detailed description of the plasma parameters along the source axis, i.e. plasma temperature, density and potential, as well as current densities and species fluxes. The inputs to the model are currently the RF power, the magnetic filter field and the source gas pressure. Results from the model are presented and where possible compared to existing experimental data from SNIF, with varying RF power, source pressure.

Magnetron Electron Gun,

DTIC Science & Technology

1980-05-23

ULMAGNETRON ELECTRON GUN . (U) .Ay G0 A L GOLOENBERG, T B PANKRATOVA UNCLASSIFIED FTD..In(RS)T41896-?9 4 __ ihD - -111113 MICROCOPY RESOLUTION TEST...CHART NATIONAL BUREAU OF STANDARD 1961 A -_"D-I-D ,RS)T-18q6-79 v FOREIGN TECHNOLOGY DIVISION MAGNETRON ELECTRON GUN by A. L. Gol’denberg, T. B...VISION. WP.AP6. OHIO. FTD -ID(RS)T-1396-79 Date z.-.:a’,-lq -,o • 110ewm /A Is a, -D r.l MAGNETRON ELECTRON GUN A. L. Gol’denberg, T. B. Pankratova and M

Numerical Simulation of Ion Transport in a Nano-Electrospray Ion Source at Atmospheric Pressure

NASA Astrophysics Data System (ADS)

Wang, Wei; Bajic, Steve; John, Benzi; Emerson, David R.

2018-03-01

Understanding ion transport properties from the ion source to the mass spectrometer (MS) is essential for optimizing device performance. Numerical simulation helps in understanding of ion transport properties and, furthermore, facilitates instrument design. In contrast to previously reported numerical studies, ion transport simulations in a continuous injection mode whilst considering realistic space-charge effects have been carried out. The flow field was solved using Reynolds-averaged Navier-Stokes (RANS) equations, and a particle-in-cell (PIC) method was applied to solve a time-dependent electric field with local charge density. A series of ion transport simulations were carried out at different cone gas flow rates, ion source currents, and capillary voltages. A force evaluation analysis reveals that the electric force, the drag force, and the Brownian force are the three dominant forces acting on the ions. Both the experimental and simulation results indicate that cone gas flow rates of ≤250 slph (standard liter per hour) are important for high ion transmission efficiency, as higher cone gas flow rates reduce the ion signal significantly. The simulation results also show that the ion transmission efficiency reduces exponentially with an increased ion source current. Additionally, the ion loss due to space-charge effects has been found to be predominant at a higher ion source current, a lower capillary voltage, and a stronger cone gas counterflow. The interaction of the ion driving force, ion opposing force, and ion dispersion is discussed to illustrate ion transport mechanism in the ion source at atmospheric pressure. [Figure not available: see fulltext.

Numerical Simulation of Ion Transport in a Nano-Electrospray Ion Source at Atmospheric Pressure.

PubMed

Wang, Wei; Bajic, Steve; John, Benzi; Emerson, David R

2018-03-01

Understanding ion transport properties from the ion source to the mass spectrometer (MS) is essential for optimizing device performance. Numerical simulation helps in understanding of ion transport properties and, furthermore, facilitates instrument design. In contrast to previously reported numerical studies, ion transport simulations in a continuous injection mode whilst considering realistic space-charge effects have been carried out. The flow field was solved using Reynolds-averaged Navier-Stokes (RANS) equations, and a particle-in-cell (PIC) method was applied to solve a time-dependent electric field with local charge density. A series of ion transport simulations were carried out at different cone gas flow rates, ion source currents, and capillary voltages. A force evaluation analysis reveals that the electric force, the drag force, and the Brownian force are the three dominant forces acting on the ions. Both the experimental and simulation results indicate that cone gas flow rates of ≤250 slph (standard liter per hour) are important for high ion transmission efficiency, as higher cone gas flow rates reduce the ion signal significantly. The simulation results also show that the ion transmission efficiency reduces exponentially with an increased ion source current. Additionally, the ion loss due to space-charge effects has been found to be predominant at a higher ion source current, a lower capillary voltage, and a stronger cone gas counterflow. The interaction of the ion driving force, ion opposing force, and ion dispersion is discussed to illustrate ion transport mechanism in the ion source at atmospheric pressure. Graphical Abstract.

Laser ion source with solenoid for Brookhaven National Laboratory-electron beam ion sourcea)

NASA Astrophysics Data System (ADS)

Kondo, K.; Yamamoto, T.; Sekine, M.; Okamura, M.

2012-02-01

The electron beam ion source (EBIS) preinjector at Brookhaven National Laboratory (BNL) is a new heavy ion-preinjector for relativistic heavy ion collider (RHIC) and NASA Space Radiation Laboratory (NSRL). Laser ion source (LIS) is a primary ion source provider for the BNL-EBIS. LIS with solenoid at the plasma drift section can realize the low peak current (˜100 μA) with high charge (˜10 nC) which is the BNL-EBIS requirement. The gap between two solenoids does not cause serious plasma current decay, which helps us to make up the BNL-EBIS beamline.

Experimental radiation cooled magnetrons for space

NASA Astrophysics Data System (ADS)

Brown, W. C.; Pollock, M.

The heat disposal problem that occurs in the microwave generator of the Solar Power Satellite when it converts dc power from solar photovoltaic arrays into microwave power for transmission to earth is examined. A theoretical study is made of the radiation cooling of a magnetron directional amplifier, and some experimental data obtained from the QKH 2244 magnetron are presented. This instrument is an unpackaged microwave oven magnetron to which an anodized aluminum radiator has been attached and whose magnetic field is supplied by special samarium cobalt magnets.

Electrospray ion source with reduced analyte electrochemistry

DOEpatents

Kertesz, Vilmos [Knoxville, TN; Van Berkel, Gary [Clinton, TN

2011-08-23

An electrospray ion (ESI) source and method capable of ionizing an analyte molecule without oxidizing or reducing the analyte of interest. The ESI source can include an emitter having a liquid conduit, a working electrode having a liquid contacting surface, a spray tip, a secondary working electrode, and a charge storage coating covering partially or fully the liquid contacting surface of the working electrode. The liquid conduit, the working electrode and the secondary working electrode can be in liquid communication. The electrospray ion source can also include a counter electrode proximate to, but separated from, said spray tip. The electrospray ion source can also include a power system for applying a voltage difference between the working electrodes and a counter-electrode. The power system can deliver pulsed voltage changes to the working electrodes during operation of said electrospray ion source to minimize the surface potential of the charge storage coating.

Electrospray ion source with reduced analyte electrochemistry

DOEpatents

Kertesz, Vilmos; Van Berkel, Gary J

2013-07-30

An electrospray ion (ESI) source and method capable of ionizing an analyte molecule without oxidizing or reducing the analyte of interest. The ESI source can include an emitter having a liquid conduit, a working electrode having a liquid contacting surface, a spray tip, a secondary working electrode, and a charge storage coating covering partially or fully the liquid contacting surface of the working electrode. The liquid conduit, the working electrode and the secondary working electrode can be in liquid communication. The electrospray ion source can also include a counter electrode proximate to, but separated from, said spray tip. The electrospray ion source can also include a power system for applying a voltage difference between the working electrodes and a counter-electrode. The power system can deliver pulsed voltage changes to the working electrodes during operation of said electrospray ion source to minimize the surface potential of the charge storage coating.

Fourth-generation plasma immersion ion implantation and deposition facility for hybrid surface modification layer fabrication.

PubMed

Wang, Langping; Huang, Lei; Xie, Zhiwen; Wang, Xiaofeng; Tang, Baoyin

2008-02-01

The fourth-generation plasma immersion ion implantation and deposition (PIIID) facility for hybrid and batch treatment was built in our laboratory recently. Comparing with our previous PIIID facilities, several novel designs are utilized. Two multicathode pulsed cathodic arc plasma sources are fixed on the chamber wall symmetrically, which can increase the steady working time from 6 h (the single cathode source in our previous facilities) to about 18 h. Meanwhile, the inner diameter of the pulsed cathodic arc plasma source is increased from the previous 80 to 209 mm, thus, large area metal plasma can be obtained by the source. Instead of the simple sample holder in our previous facility, a complex revolution-rotation sample holder composed of 24 shafts, which can rotate around its axis and adjust its position through revolving around the center axis of the vacuum chamber, is fixed in the center of the vacuum chamber. In addition, one magnetron sputtering source is set on the chamber wall instead of the top cover in the previous facility. Because of the above characteristic, the PIIID hybrid process involving ion implantation, vacuum arc, and magnetron sputtering deposition can be acquired without breaking vacuum. In addition, the PIIID batch treatment of cylinderlike components can be finished by installing these components on the rotating shafts on the sample holder.

Multi-cathode unbalanced magnetron sputtering systems

NASA Technical Reports Server (NTRS)

Sproul, William D.

1991-01-01

Ion bombardment of a growing film during deposition is necessary in many instances to ensure a fully dense coating, particularly for hard coatings. Until the recent advent of unbalanced magnetron (UBM) cathodes, reactive sputtering had not been able to achieve the same degree of ion bombardment as other physical vapor deposition processes. The amount of ion bombardment of the substrate depends on the plasma density at the substrate, and in a UBM system the amount of bombardment will depend on the degree of unbalance of the cathode. In multi-cathode systems, the magnetic fields between the cathodes must be linked to confine the fast electrons that collide with the gas atoms. Any break in this linkage results in electrons being lost and a low plasma density. Modeling of the magnetic fields in a UBM cathode using a finite element analysis program has provided great insight into the interaction between the magnetic fields in multi-cathode systems. Large multi-cathode systems will require very strong magnets or many cathodes in order to maintain the magnetic field strength needed to achieve a high plasma density. Electromagnets offer the possibility of independent control of the plasma density. Such a system would be a large-scale version of an ion beam enhanced deposition (IBED) system, but, for the UBM system where the plasma would completely surround the substrate, the acronym IBED might now stand for Ion Blanket Enhanced Deposition.

Full System Model of Magnetron Sputter Chamber - Proof-of-Principle Study

DOE Office of Scientific and Technical Information (OSTI.GOV)

Walton, C; Gilmer, G; Zepeda-Ruiz, L

2007-05-04

The lack of detailed knowledge of internal process conditions remains a key challenge in magnetron sputtering, both for chamber design and for process development. Fundamental information such as the pressure and temperature distribution of the sputter gas, and the energies and arrival angles of the sputtered atoms and other energetic species is often missing, or is only estimated from general formulas. However, open-source or low-cost tools are available for modeling most steps of the sputter process, which can give more accurate and complete data than textbook estimates, using only desktop computations. To get a better understanding of magnetron sputtering, wemore » have collected existing models for the 5 major process steps: the input and distribution of the neutral background gas using Direct Simulation Monte Carlo (DSMC), dynamics of the plasma using Particle In Cell-Monte Carlo Collision (PIC-MCC), impact of ions on the target using molecular dynamics (MD), transport of sputtered atoms to the substrate using DSMC, and growth of the film using hybrid Kinetic Monte Carlo (KMC) and MD methods. Models have been tested against experimental measurements. For example, gas rarefaction as observed by Rossnagel and others has been reproduced, and it is associated with a local pressure increase of {approx}50% which may strongly influence film properties such as stress. Results on energies and arrival angles of sputtered atoms and reflected gas neutrals are applied to the Kinetic Monte Carlo simulation of film growth. Model results and applications to growth of dense Cu and Be films are presented.« less

Laser-ablation-based ion source characterization and manipulation for laser-driven ion acceleration

NASA Astrophysics Data System (ADS)

Sommer, P.; Metzkes-Ng, J.; Brack, F.-E.; Cowan, T. E.; Kraft, S. D.; Obst, L.; Rehwald, M.; Schlenvoigt, H.-P.; Schramm, U.; Zeil, K.

2018-05-01

For laser-driven ion acceleration from thin foils (∼10 μm–100 nm) in the target normal sheath acceleration regime, the hydro-carbon contaminant layer at the target surface generally serves as the ion source and hence determines the accelerated ion species, i.e. mainly protons, carbon and oxygen ions. The specific characteristics of the source layer—thickness and relevant lateral extent—as well as its manipulation have both been investigated since the first experiments on laser-driven ion acceleration using a variety of techniques from direct source imaging to knife-edge or mesh imaging. In this publication, we present an experimental study in which laser ablation in two fluence regimes (low: F ∼ 0.6 J cm‑2, high: F ∼ 4 J cm‑2) was applied to characterize and manipulate the hydro-carbon source layer. The high-fluence ablation in combination with a timed laser pulse for particle acceleration allowed for an estimation of the relevant source layer thickness for proton acceleration. Moreover, from these data and independently from the low-fluence regime, the lateral extent of the ion source layer became accessible.

A Fast-Ion Source for LAPD

NASA Astrophysics Data System (ADS)

Zhao, L.; Boehmer, H.; Edrich, D.; Heidbrink, W. W.; McWilliams, R.; Leneman, D.

2002-11-01

To measure the fast-ion transport as a function of gyroradius, a 3-cm diameter, 17 MHz, ˜ 80 W, ˜ 3 mA, argon source is under development for use in the LArge Plasma Device (LAPD). In tests on the Irvine Mirror, the source performs reliably when oriented either parallel to the magnetic field or at an oblique angle and in either a CW or pulsed mode of operation. A radial energy analyzer measures the profile of the 200-500 eV beam. Laser-induced fluorescence (LIF) of cold 3d^2G_9/2 argon metastables excited by the source is readily measured but the hot argon ions in the beam itself are more difficult to detect. In preliminary tests on LAPD, the source operated successfully. Planned physics experiments include measurements of collisional fast-ion diffusion and fluctuation-induced transport.

Universal main magnetic focus ion source for production of highly charged ions

NASA Astrophysics Data System (ADS)

Ovsyannikov, V. P.; Nefiodov, A. V.; Levin, A. A.

2017-10-01

A novel room-temperature compact ion source has been developed for the efficient production of atomic ions by means of an electron beam with energy Ee and current density je controllable within wide ranges (100 eV ≲Ee ≲ 60 keV, 10 A/cm2 ≲je ≲ 20 kA/cm2). In the first experiments, the X-ray emission of Ir64+ ions has been measured. Based on a combination of two different techniques, the device can operate both as conventional Electron Beam Ion Source/Trap and novel Main Magnetic Focus Ion Source. The tunable electron-optical system allows for realizing laminar and turbulent electron flows in a single experimental setup. The device is intended primarily for fundamental and applied research at standard university laboratories.

Proceedings of the 10th international workshop on ECR ion sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Meyer, F W; Kirkpatrick, M I

This report contains papers on the following topics: Recent Developments and Future Projects on ECR Ion Sources; Operation of the New KVI ECR Ion Source at 10 GHz; Operational Experience and Status of the INS SF-ECR Ion Source; Results of the New ECR4'' 14.5 GHz ECRIS; Preliminary Performance of the AECR; Experimental Study of the Parallel and Perpendicular Particle Losses from an ECRIS Plasma; Plasma Instability in Electron Cyclotron Resonance Heated Ion Sources; The Hyperbolic Energy Analyzer; Status of ECR Source Development; The New 10 GHz CAPRICE Source; First Operation of the Texas A M ECR Ion Source; Recent Developmentsmore » of the RIKEN ECR Ion Sources; The 14 GHz CAPRICE Source; Characteristics and Potential Applications of an ORNL Microwave ECR Multicusp Plasma Ion Source; ECRIPAC: The Production and Acceleration of Multiply Charged Ions Using an ECR Plasma; ECR Source for the HHIRF Tandem Accelerator; Feasibility Studies for an ECR-Generated Plasma Stripper; Production of Ion Beams by using the ECR Plasmas Cathode; A Single Stage ECR Source for Efficient Production of Radioactive Ion Beams; The Single Staged ECR Source at the TRIUMF Isotope Separator TISOL; The Continuous Wave, Optically Pumped H{sup {minus}} Source; The H{sup +} ECR Source for the LAMPF Optically Pumped Polarized Ion Source; Present Status of the Warsaw CUSP ECR Ion Source; An ECR Source for Negative Ion Production; GYRAC-D: A Device for a 200 keV ECR Plasma Production and Accumulation; Status Report of the 14.4 GHZ ECR in Legnaro; Status of JYFL-ECRIS; Report on the Uppsala ECRIS Facility and Its Planned Use for Atomic Physics; A 10 GHz ECR Ion Source for Ion-Electron and Ion-Atom Collision Studies; and Status of the ORNL ECR Source Facility for Multicharged Ion Collision Research.« less

H(-) ion source developments at the SNS.

PubMed

Welton, R F; Stockli, M P; Murray, S N; Pennisi, T R; Han, B; Kang, Y; Goulding, R H; Crisp, D W; Sparks, D O; Luciano, N P; Carmichael, J R; Carr, J

2008-02-01

The U.S. Spallation Neutron Source (SNS) will require substantially higher average and pulse H(-) beam currents than can be produced from conventional ion sources such as the base line SNS source. H(-) currents of 40-50 mA (SNS operations) and 70-100 mA (power upgrade project) with a rms emittance of 0.20-0.35pi mm mrad and a approximately 7% duty factor will be needed. We are therefore investigating several advanced ion source concepts based on rf plasma excitation. First, the performance characteristics of an external antenna source based on an Al(2)O(3) plasma chamber combined with an external multicusp magnetic configuration, an elemental Cs system, and plasma gun will be discussed. Second, the first plasma measurements of a helicon-driven H(-) ion source will also be presented.

H- ion source developments at the SNSa)

NASA Astrophysics Data System (ADS)

Welton, R. F.; Stockli, M. P.; Murray, S. N.; Pennisi, T. R.; Han, B.; Kang, Y.; Goulding, R. H.; Crisp, D. W.; Sparks, D. O.; Luciano, N. P.; Carmichael, J. R.; Carr, J.

2008-02-01

The U.S. Spallation Neutron Source (SNS) will require substantially higher average and pulse H- beam currents than can be produced from conventional ion sources such as the base line SNS source. H- currents of 40-50mA (SNS operations) and 70-100mA (power upgrade project) with a rms emittance of 0.20-0.35πmmmrad and a ˜7% duty factor will be needed. We are therefore investigating several advanced ion source concepts based on rf plasma excitation. First, the performance characteristics of an external antenna source based on an Al2O3 plasma chamber combined with an external multicusp magnetic configuration, an elemental Cs system, and plasma gun will be discussed. Second, the first plasma measurements of a helicon-driven H- ion source will also be presented.

Ion induced crystallization and grain growth of hafnium oxide nano-particles in thin-films deposited by radio frequency magnetron sputtering

NASA Astrophysics Data System (ADS)

Dhanunjaya, M.; Khan, S. A.; Pathak, A. P.; Avasthi, D. K.; Nageswara Rao, S. V. S.

2017-12-01

We report on the swift heavy ion (SHI) irradiation induced crystallization and grain growth of HfO2 nanoparticles (NPs) within the HfO2 thin-films deposited by radio frequency (RF) magnetron sputtering technique. As grown films consisted of amorphous clusters of non-spherical HfO2 NPs. These amorphous clusters are transformed to crystalline grains under 100 MeV Ag ion irradiation. These crystallites are found to be spherical in shape and are well dispersed within the films. The average size of these crystallites is found to increase with fluence. Pristine and irradiated films have been characterized by high resolution transmission electron microscopy (HRTEM), selected area electron diffraction (SAED), grazing incident x-ray diffraction (GIXRD) and photo luminescence (PL) measurements. The PL measurements suggested the existence of different types of oxygen related defects in pristine and irradiated samples. The observed results on crystallization and grain growth under the influence of SHI are explained within the framework of thermal spike model. The results are expected to provide useful information for understanding the electronic excitation induced crystallization of nanoparticles and can lead to useful applications in electronic and photonic devices.

Compact 2.45 GHz ECR Ion Source for generation of singly-charged ions

NASA Astrophysics Data System (ADS)

Fatkullin, Riyaz; Bogomolov, Sergey; Kuzmenkov, Konstantin; Efremov, Andrey

2018-04-01

2.45 GHz ECR ion sources are widely used for production of protons, single charged heavy ions and secondary radioactive ion beams. This paper describes the development of a compact ECR ion source based on 2.45 GHz coaxial resonator. The first results of extracted current measurements at different resonator configuration as a function of UHF frequency, power and gas flow are presented.

Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tucker, M. D.; Marks, N. A.; Ganesan, R.

2016-04-21

High-power impulse magnetron sputtering (HiPIMS) is used to deposit amorphous carbon thin films with sp{sup 3} fractions of 13% to 82%. Increasing the pulse length results in a transition from conventional HiPIMS deposition to a “mixed-mode” in which an arc triggers on the target surface, resulting in a large flux of carbon ions. The films are characterized using X-ray photoelectron spectroscopy, Raman spectroscopy, ellipsometry, nanoindentation, elastic recoil detection analysis, and measurements of stress and contact angle. All properties vary in a consistent manner, showing a high tetrahedral character only for long pulses, demonstrating that mixed-mode deposition is the source ofmore » the high carbon ion flux. Varying the substrate bias reveals an “energy window” effect, where the sp{sup 3} fraction of the films is greatest for a substrate bias around −100 V and decreases for higher or lower bias values. In the absence of bias, the films' properties show little dependence on the pulse length, showing that energetic ions are the origin of the highly tetrahedral character.« less

Ion Source Development at the SNS

NASA Astrophysics Data System (ADS)

Welton, R. F.; Stockli, M. P.; Murray, S. N.; Carr, J.; Carmichael, J.; Goulding, R. H.; Baity, F. W.

2007-08-01

The US Spallation Neutron Source (SNS) has recently begun producing neutrons and is currently on track to becoming a world-leading facility for material science based on neutron scattering. The facility is comprised of an H- ion source, a linear accelerator, an accumulator ring, a liquid-Hg target and a suite of neutron scattering instruments. Over the next several years the average H- current from the ion source will be increased in order to meet the baseline facility requirement of providing 1.4 MW of beam-power to the target and the SNS power upgrade power requirement of 2+ MW on target. Meeting the latter goal will require H- currents of 70-100 mA with an RMS emittance of 0.20-0.35 π mm mrad and a ˜7% duty-factor. To date, the RF-driven-multicusp SNS ion source has only been able to demonstrate sustained operation at 33 mA of beam current at a ˜7% duty-factor. This report details our efforts to develop variations of the current ion source which can meet these requirements. Designs and experimental results are presented for helicon plasma drivers, high-power external antennas, glow-discharge plasma guns and advanced Cs systems.

Satellite Power System (SPS) magnetron tube assessment study

NASA Technical Reports Server (NTRS)

Brown, W. C.

1981-01-01

The data base was extended with respect to the magnetron directional amplifier and its operating parameters that are pertinent to its application in the solar power satellite. On the basis of the resulting extended data base the design of a magnetron was outlined that would meet the requirements of the SPS application and a technology program was designed that would result in its development. The proposed magnetron design for the SPS is a close scale of the microwave oven magnetron, and resembles it closely physically and electrically.

Study of the wear resistance of ion-plasma coatings based on titanium and aluminum and obtained by magnetron sputtering

NASA Astrophysics Data System (ADS)

Kachalin, G. V.; Mednikov, A. F.; Tkhabisimov, A. B.; Sidorov, S. V.

2017-05-01

The paper presents the results of metallographic researches and erosion tests of ion-plasma coatings (based on titanium, aluminum and their nitrides), which were formed on samples of 12Kh13 and EI961 blade steels. Erosion tests and studies of characteristics of obtained by magnetron sputtering coatings were carried out by using a set of research equipment UNU “Erosion-M” NRU “MPEI”. It was found that the formed Ti/Al-TiN/AlN coatings increase the duration of blade steels erosion wear incubation period by at least in 1.5 times and have a layered structure with thicknesses of nitride layers 1.3-1.6 μm and intermediate metallic layers 0.3-0.5 μm, with a total thickness of coatings of 10-14 μm for 12Kh13steel samples and 19-21 μm for EI961 steel samples.

Means for obtaining a metal ion beam from a heavy-ion cyclotron source

DOEpatents

Hudson, E.D.; Mallory, M.L.

1975-08-01

A description is given of a modification to a cyclotron ion source used in producing a high intensity metal ion beam. A small amount of an inert support gas maintains the usual plasma arc, except that it is necessary for the support gas to have a heavy mass, e.g., xenon or krypton as opposed to neon. A plate, fabricated from the metal (or anything that can be sputtered) to be ionized, is mounted on the back wall of the ion source arc chamber and is bombarded by returning energetic low-charged gas ions that fail to cross the initial accelerating gap between the ion source and the accelerating electrode. Some of the atoms that are dislodged from the plate by the returning gas ions become ionized and are extracted as a useful beam of heavy ions. (auth)

Studies in High Current Density Ion Sources for Heavy Ion Fusion Applications

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chacon-Golcher, Edwin

This dissertation develops diverse research on small (diameter ~ few mm), high current density (J ~ several tens of mA/cm 2) heavy ion sources. The research has been developed in the context of a programmatic interest within the Heavy Ion Fusion (HIF) Program to explore alternative architectures in the beam injection systems that use the merging of small, bright beams. An ion gun was designed and built for these experiments. Results of average current density yield () at different operating conditions are presented for K + and Cs + contact ionization sources and potassium aluminum silicate sources. Maximum valuesmore » for a K + beam of ~90 mA/cm 2 were observed in 2.3 μs pulses. Measurements of beam intensity profiles and emittances are included. Measurements of neutral particle desorption are presented at different operating conditions which lead to a better understanding of the underlying atomic diffusion processes that determine the lifetime of the emitter. Estimates of diffusion times consistent with measurements are presented, as well as estimates of maximum repetition rates achievable. Diverse studies performed on the composition and preparation of alkali aluminosilicate ion sources are also presented. In addition, this work includes preliminary work carried out exploring the viability of an argon plasma ion source and a bismuth metal vapor vacuum arc (MEVVA) ion source. For the former ion source, fast rise-times (~ 1 μs), high current densities (~ 100 mA/cm +) and low operating pressures (< 2 mtorr) were verified. For the latter, high but acceptable levels of beam emittance were measured (ε n ≤ 0.006 π· mm · mrad) although measured currents differed from the desired ones (I ~ 5mA) by about a factor of 10.« less

Ion current detector for high pressure ion sources for monitoring separations

DOEpatents

Smith, R.D.; Wahl, J.H.; Hofstadler, S.A.

1996-08-13

The present invention relates generally to any application involving the monitoring of signal arising from ions produced by electrospray or other high pressure (>100 torr) ion sources. The present invention relates specifically to an apparatus and method for the detection of ions emitted from a capillary electrophoresis (CE) system, liquid chromatography, or other small-scale separation methods. And further, the invention provides a very simple diagnostic as to the quality of the separation and the operation of an electrospray source. 7 figs.

Ion current detector for high pressure ion sources for monitoring separations

DOEpatents

Smith, Richard D.; Wahl, Jon H.; Hofstadler, Steven A.

1996-01-01

The present invention relates generally to any application involving the monitoring of signal arising from ions produced by electrospray or other high pressure (>100 torr) ion sources. The present invention relates specifically to an apparatus and method for the detection of ions emitted from a capillary electrophoresis (CE) system, liquid chromatography, or other small-scale separation methods. And further, the invention provides a very simple diagnostic as to the quality of the separation and the operation of an electrospray source.

Use of predissociation to enhance the atomic hydrogen ion fraction in ion sources

DOEpatents

Kim, Jinchoon

1979-01-01

A duopigatron ion source is modified by replacing the normal oxide-coated wire filament cathode of the ion source with a hot tungsten oven through which hydrogen gas is fed into the arc chamber. The hydrogen gas is predissociated in the hot oven prior to the arc discharge, and the recombination rate is minimized by hot walls inside of the arc chamber. With the use of the above modifications, the atomic H.sub.1.sup.+ ion fraction output can be increased from the normal 50% to greater than 70% with a corresponding decrease in the H.sub.2.sup.+ and H.sub.3.sup.+ molecular ion fraction outputs from the ion source.

Low temperature ion source for calutrons

DOEpatents

Veach, Allen M.; Bell, Jr., William A.; Howell, Jr., George D.

1981-01-01

A new ion source assembly for calutrons has been provided for the efficient separation of elements having high vapor pressures. The strategic location of cooling pads and improved insulation permits operation of the source at lower temperatures. A vapor valve constructed of graphite and located in a constantly increasing temperature gradient provides reliable control of the vapor flow from the charge bottle to the arc chamber. A pronounced saving in calutron operating time and equipment maintenance has been achieved with the use of the present ion source.

Low temperature ion source for calutrons

DOEpatents

Veach, A.M.; Bell, W.A. Jr.; Howell, G.D. Jr.

1979-10-10

A new ion source assembly for calutrons has been provided for the efficient separation of elements having high vapor pressures. The strategic location of cooling pads and improved insulation permits operation of the source at lower temperatures. A vapor valve constructed of graphite and located in a constantly increasing temperature gradient provides reliable control of the vapor flow from the charge bottle to the arc chamber. A pronounced saving in calutron operating time and equipment maintenance has been achieved with the use of the present ion source.

ION SOURCE

DOEpatents

Brobeck, W.M.

1959-04-14

This patent deals with calutrons and more particularly to an arrangement therein whereby charged bottles in a calutron source unit may be replaced without admitting atmospheric air to the calutron vacuum chamber. As described, an ion unit is disposed within a vacuum tank and has a reservoir open toward a wall of the tank. A spike projects from thc source into the reservoir. When a charge bottle is placed in the reservoir, the spike breaks a frangible seal on the bottle. After the contents of the bottle are expended the bottle may be withdrawn and replaced with another charge bottle by a varuum lock arrangement in conjunction with an arm for manipulating the bottle.

Ion source

DOEpatents

Brobeck, W. M.

1959-04-14

This patent deals with calutrons and more particularly to an arrangement therein whereby charged bottles in a calutron source unit may be replaced without admitting atmospheric air to the calutron vacuum chamber. As described, an ion unit is disposed within a vacuum tank and has a reservoir open toward a wall of the tank. A spike projects from the source into the reservoir. When a charge bottle is placed in the reservoir, the spike breaks a frangible seal on the bottle. After the contents of the bottle are expended the bottle may be withdrawn and replaced with another charge bottle by a vacuum lock arrangement in conjunction with an arm for manipulating the bottle.

High current ion source

DOEpatents

Brown, Ian G.; MacGill, Robert A.; Galvin, James E.

1990-01-01

An ion source utilizing a cathode and anode for producing an electric arc therebetween. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma leaves the generation region and expands through another regon. The density profile of the plasma may be flattened using a magnetic field formed within a vacuum chamber. Ions are extracted from the plasma to produce a high current broad on beam.

Development of electron beam ion source for nanoprocess using highly charged ions

NASA Astrophysics Data System (ADS)

Sakurai, Makoto; Nakajima, Fumiharu; Fukumoto, Takunori; Nakamura, Nobuyuki; Ohtani, Shunsuke; Mashiko, Shinro; Sakaue, Hiroyuki

2005-07-01

Highly charged ion is useful to produce nanostructure on various materials, and is key tool to realize single ion implantation technique. On such demands for the application to nanotechnology, we have designed an electron bean ion source. The design stresses on the volume of drift tubes where highly charged ions are confined and the efficiency of ion extraction from the drift tube through collector electrode in order to obtain intense ion beam as much as possible. The ion source uses a discrete superconducting magnet cooled by a closed-cycle refrigerator in order to reduce the running costs and to simplify the operating procedures. The electrodes of electron gun, drift tubes, and collector are enclosed in ultrahigh vacuum tube that is inserted into the bore of the magnet system.

Saddle antenna radio frequency ion sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Dudnikov, V., E-mail: vadim@muonsinc.com; Johnson, R.; Murray, S.

Existing RF ion sources for accelerators have specific efficiencies for H{sup +} and H{sup −} ion generation ∼3–5 mA/cm{sup 2} kW, where about 50 kW of RF power is typically needed for 50 mA beam current production. The Saddle Antenna (SA) surface plasma source (SPS) described here was developed to improve H{sup −} ion production efficiency, reliability, and availability. In SA RF ion source, the efficiency of positive ion generation in the plasma has been improved to 200 mA/cm{sup 2} kW. After cesiation, the current of negative ions to the collector was increased from 1 mA to 10 mA withmore » RF power ∼1.5 kW in the plasma (6 mm diameter emission aperture) and up to 30 mA with ∼4 kW RF. Continuous wave (CW) operation of the SA SPS has been tested on the test stand. The general design of the CW SA SPS is based on the pulsed version. Some modifications were made to improve the cooling and cesiation stability. CW operation with negative ion extraction was tested with RF power up to ∼1.2 kW in the plasma with production up to Ic = 7 mA. A stable long time generation of H{sup −} beam without degradation was demonstrated in RF discharge with AlN discharge chamber.« less

New ion source for KSTAR neutral beam injection system.

PubMed

Kim, Tae-Seong; Jeong, Seung Ho; In, Sang-Ryul

2012-02-01

The neutral beam injection system (NBI-1) of the KSTAR tokamak can accommodate three ion sources; however, it is currently equipped with only one prototype ion source. In the 2010 and 2011 KSTAR campaigns, this ion source supplied deuterium neutral beam power of 0.7-1.6 MW to the KSTAR plasma with a beam energy of 70-100 keV. A new ion source will be prepared for the 2012 KSTAR campaign with a much advanced performance compared with the previous one. The newly designed ion source has a very large transparency (∼56%) without deteriorating the beam optics, which is designed to deliver a 2 MW injection power of deuterium beams at 100 keV. The plasma generator of the ion source is of a horizontally cusped bucket type, and the whole inner wall, except the cathode filaments and plasma grid side, functions as an anode. The accelerator assembly consists of four multi-circular aperture grids made of copper and four electrode flanges made of aluminum alloy. The electrodes are insulated using PEEK. The ion source will be completed and tested in 2011.

Low energy spread ion source with a coaxial magnetic filter

DOEpatents

Leung, Ka-Ngo; Lee, Yung-Hee Yvette

2000-01-01

Multicusp ion sources are capable of producing ions with low axial energy spread which are necessary in applications such as ion projection lithography (IPL) and radioactive ion beam production. The addition of a radially extending magnetic filter consisting of a pair of permanent magnets to the multicusp source reduces the energy spread considerably due to the improvement in the uniformity of the axial plasma potential distribution in the discharge region. A coaxial multicusp ion source designed to further reduce the energy spread utilizes a cylindrical magnetic filter to achieve a more uniform axial plasma potential distribution. The coaxial magnetic filter divides the source chamber into an outer annular discharge region in which the plasma is produced and a coaxial inner ion extraction region into which the ions radially diffuse but from which ionizing electrons are excluded. The energy spread in the coaxial source has been measured to be 0.6 eV. Unlike other ion sources, the coaxial source has the capability of adjusting the radial plasma potential distribution and therefore the transverse ion temperature (or beam emittance).

Investigation of high power impulse magnetron sputtering (HIPIMS) discharge using fast ICCD camera

NASA Astrophysics Data System (ADS)

Hecimovic, Ante

2012-10-01

High power impulse magnetron sputtering (HIPIMS) combines impulse glow discharges at power levels up to the MW range with conventional magnetron cathodes to achieve a highly ionised sputtered flux. The dynamics of the HIPIMS discharge was investigated using fast Intensified Charge Coupled Device (ICCD) camera. In the first experiment the HIPIMS plasma was recorded from the side with goal to analyse the plasma intensity using Abel inversion to obtain the emissivity maps of the plasma species. Resulting emissivity maps provide the information on the spatial distribution of Ar and sputtered material and evolution of the plasma chemistry above the cathode. In the second experiment the plasma emission was recorded with camera facing the target. The images show that the HIPIMS plasma develops drift wave type instabilities characterized by well defined regions of high and low plasma emissivity along the racetrack of the magnetron. The instabilities cause periodic shifts in the floating potential. The structures rotate in ExB direction at velocities of 10 kms-1 and frequencies up to 200 kHz. The high emissivity regions comprise Ar and metal ion emission with strong Ar and metal neutral emission depletion. A detailed analysis of the temporal evolution of the saturated instabilities using four consequently triggered fast ICCD cameras is presented. Furthermore working gas pressure and discharge current variation showed that the shape and the speed of the instability strongly depend on the working gas and target material combination. In order to better understand the mechanism of the instability, different optical interference band pass filters (of metal and gas atom, and ion lines) were used to observe the spatial distribution of each species within the instability.

Ion Energy Distribution Studies of Ions and Radicals in an Ar/H2 Radio Frequency Magnetron Discharge During a-Si:H Deposition Using Energy-Resolved Mass Spectrometry

NASA Astrophysics Data System (ADS)

Mensah, Samuel; Abu-Safe, Husam; Naseem, Hameed; Gordon, Matt

2012-02-01

Ion energy distributions of sputtered Si particles have been measured by an energy-resolved mass spectrometer, and we correlate the results with measured thin film properties. The plasmas have been generated in a conventional magnetron chamber powered at 150W, 13.56MHz at hydrogen flow rates ranging from 0-25sccm. Various Hn^+, SiHn^+, SiHn fragments (with n = 1, 2, 3) together with Ar^+ and ArH^+ species were detected in the discharge. The most important species for the film deposition is SiHn with n = 0,1,2, and H fragments affect the hydrogen content in the material. The flux of Ar^+ decreases and that of ArH^+ increases when the hydrogen flow rate was increased. However both fluxes saturate at hydrogen flow rates above 15sccm. Plasma parameters, such as plasma potential Vp, electron density ne and electron energy Te, are measured with the Langmuir probe. The ion energy distribution (IED) of all prominent species in the plasma is measured with an energy resolved mass analyzer. The plasma parameters decreased with increasing hydrogen flow rate; Vp, ne and Te decreased from 36.5V, 7.2x10^15 m-3, 5.6eV to 32.8, 2.2x10^15m-3 and 3.8eV respectively. The ion energy of the heavy species, Ar, Ar^+, ArH, ArH^+, SiHn and SiHn^+ radicals have ion energies comparable to the plasma potential. Analysis of the IEDs shows an inter-dependence of the species and their contribution to the thin film growth and properties.

Pantechnik new superconducting ion source: PantechniK Indian Superconducting Ion Source.

PubMed

Gaubert, G; Bieth, C; Bougy, W; Brionne, N; Donzel, X; Leroy, R; Sineau, A; Vallerand, C; Villari, A C C; Thuillier, T

2012-02-01

The new ECR ion source PantechniK Indian Superconducting Ion Source (PKISIS) was recently commissioned at Pantechnik. Three superconducting coils generate the axial magnetic field configuration, while the radial magnetic field is done with the multi-layer permanent magnets. Special care was devoted to the design of the hexapolar structure, allowing a maximum magnetic field of 1.32 T at the wall of the 82 mm diameter plasma chamber. The three superconducting coils using low temperature superconducting wires are cooled by a single double stage cryo-cooler (4.2 K). Cryogen-free technology is used, providing reliability and easy maintenance at low cost. The maximum installed RF power (18.0 GHz) is of 2 kW. Metallic beams can be produced with an oven (T(max) = 1400 °C) installed with an angle of 5° with respect to the source axis or a sputtering system, mounted on the axis of the source. The beam extraction system is constituted of three electrodes in accel-decel configuration. The new source of Pantechnik is conceived for reaching optimum performances at 18 GHz RF frequencies. PKISIS magnetic fields are 2.1 T axial B(inj) and 1.32 T radial field in the wall, variable B(min) with an independent coil and a large and opened extraction region. Moreover, PKISIS integrates modern design concepts, like RF direct injection (2 kW availability), dc-bias moving disk, out-of-axis oven and axial sputtering facility for metal beams. Finally, PKISIS is also conceived in order to operate in a high-voltage platform with minor power consumption.

Rarefaction windows in a high-power impulse magnetron sputtering plasma

DOE Office of Scientific and Technical Information (OSTI.GOV)

Palmucci, Maria; Britun, Nikolay; Konstantinidis, Stephanos

2013-09-21

The velocity distribution function of the sputtered particles in the direction parallel to the planar magnetron cathode is studied by spatially- and time-resolved laser-induced fluorescence spectroscopy in a short-duration (20 μs) high-power impulse magnetron sputtering discharge. The experimental evidence for the neutral and ionized sputtered particles to have a constant (saturated) velocity at the end of the plasma on-time is demonstrated. The velocity component parallel to the target surface reaches the values of about 5 km/s for Ti atoms and ions, which is higher that the values typically measured in the direct current sputtering discharges before. The results point outmore » on the presence of a strong gas rarefaction significantly reducing the sputtered particles energy dissipation during a certain time interval at the end of the plasma pulse, referred to as “rarefaction window” in this work. The obtained results agree with and essentially clarify the dynamics of HiPIMS discharge studied during the plasma off-time previously in the work: N. Britun, Appl. Phys. Lett. 99, 131504 (2011)« less

The extraction of negative carbon ions from a volume cusp ion source

NASA Astrophysics Data System (ADS)

Melanson, Stephane; Dehnel, Morgan; Potkins, Dave; McDonald, Hamish; Hollinger, Craig; Theroux, Joseph; Martin, Jeff; Stewart, Thomas; Jackle, Philip; Philpott, Chris; Jones, Tobin; Kalvas, Taneli; Tarvainen, Olli

2017-08-01

Acetylene and carbon dioxide gases are used in a filament-powered volume-cusp ion source to produce negative carbon ions for the purpose of carbon implantation for gettering applications. The beam was extracted to an energy of 25 keV and the composition was analyzed with a spectrometer system consisting of a 90° dipole magnet and a pair of slits. It is found that acetylene produces mostly C2- ions (up to 92 µA), while carbon dioxide produces mostly O- with only trace amounts of C-. Maximum C2- current was achieved with 400 W of arc power and, the beam current and composition were found to be highly dependent on the pressure in the source. The beam properties as a function of source settings are analyzed, and plasma properties are measured with a Langmuir probe. Finally, we describe testing of a new RF H- ion source, found to produce more than 6 mA of CW H- beam.

Negative ion source with low temperature transverse divergence optical system

DOEpatents

Whealton, John H.; Stirling, William L.

1986-01-01

A negative ion source is provided which has extremely low transverse divergence as a result of a unique ion focusing system in which the focal line of an ion beam emanating from an elongated, concave converter surface is outside of the ion exit slit of the source and the path of the exiting ions. The beam source operates with a minimum ion temperature which makes possible a sharply focused (extremely low transverse divergence) ribbon like negative ion beam.

Negative ion source with low temperature transverse divergence optical system

DOEpatents

Whealton, J.H.; Stirling, W.L.

1985-03-04

A negative ion source is provided which has extremely low transverse divergence as a result of a unique ion focusing system in which the focal line of an ion beam emanating from an elongated, concave converter surface is outside of the ion exit slit of the source and the path of the exiting ions. The beam source operates with a minimum ion temperature which makes possible a sharply focused (extremely low transverse divergence) ribbon like negative ion beam.

Ion energy spread and current measurements of the rf-driven multicusp ion source

NASA Astrophysics Data System (ADS)

Lee, Y.; Gough, R. A.; Kunkel, W. B.; Leung, K. N.; Perkins, L. T.; Pickard, D. S.; Sun, L.; Vujic, J.; Williams, M. D.; Wutte, D.

1997-03-01

Axial energy spread and useful beam current of positive ion beams have been carried out using a radio frequency (rf)-driven multicusp ion source. Operating the source with a 13.56 MHz induction discharge, the axial energy spread is found to be approximately 3.2 eV. The extractable beam current of the rf-driven source is found to be comparable to that of filament-discharge sources. With a 0.6 mm diameter extraction aperture, a positive hydrogen ion beam current density of 80 mA/cm2 can be obtained at a rf input power of 2.5 kW. The expected source lifetime is much longer than that of filament discharges.

Electron energy recovery system for negative ion sources

DOEpatents

Dagenhart, W.K.; Stirling, W.L.

1979-10-25

An electron energy recovery system for negative ion sources is provided. The system, employing crossed electric and magnetic fields, separates the electrons from the ions as they are extracted from the ion source plasma generator and before the ions are accelerated to their full energy. With the electric and magnetic fields oriented 90/sup 0/ to each other, the electrons remain at approximately the electrical potential at which they were generated. The electromagnetic forces cause the ions to be accelerated to the full accelerating supply voltage energy while being deflected through an angle of less than 90/sup 0/. The electrons precess out of the accelerating field region into an electron recovery region where they are collected at a small fraction of the full accelerating supply energy. It is possible, by this method, to collect > 90% of the electrons extracted along with the negative ions from a negative ion source beam at < 4% of full energy.

The Electron Beam Ion Source (EBIS)

ScienceCinema

Brookhaven Lab

2017-12-09

Brookhaven National Lab has successfully developed a new pre-injector system, called the Electron Beam Ion Source, for the Relativistic Heavy Ion Collider (RHIC) and NASA Space Radiation Laboratory science programs. The first of several planned improvemen

A HiPIMS plasma source with a magnetic nozzle that accelerates ions: application in a thruster

NASA Astrophysics Data System (ADS)

Bathgate, Stephen N.; Ganesan, Rajesh; Bilek, Marcela M. M.; McKenzie, David R.

2017-01-01

We demonstrate a solid fuel electrodeless ion thruster that uses a magnetic nozzle to collimate and accelerate copper ions produced by a high power impulse magnetron sputtering discharge (HiPIMS). The discharge is initiated using argon gas but in a practical device the consumption of argon could be minimised by exploiting the self-sputtering of copper. The ion fluence produced by the HiPIMS discharge was measured with a retarding field energy analyzer (RFEA) as a function of the magnetic field strength of the nozzle. The ion fraction of the copper was determined from the deposition rate of copper as a function of substrate bias and was found to exceed 87%. The ion fluence and ion energy increased in proportion with the magnetic field of the nozzle and the energy of the ions was found to follow a Maxwell-Boltzmann distribution with a directed velocity. The effectiveness of the magnetic nozzle in converting the randomized thermal motion of the ions into a jet was demonstrated from the energy distribution of the ions. The maximum ion exhaust velocity of at least 15.1 km/s, equivalent to a specific impulse of 1543 s was measured which is comparable to existing Hall thrusters and exceeds that of Teflon pulsed plasma thrusters.

Solenoid and monocusp ion source

DOEpatents

Brainard, John Paul; Burns, Erskine John Thomas; Draper, Charles Hadley

1997-01-01

An ion source which generates hydrogen ions having high atomic purity incorporates a solenoidal permanent magnets to increase the electron path length. In a sealed envelope, electrons emitted from a cathode traverse the magnetic field lines of a solenoid and a monocusp magnet between the cathode and a reflector at the monocusp. As electrons collide with gas, the molecular gas forms a plasma. An anode grazes the outer boundary of the plasma. Molecular ions and high energy electrons remain substantially on the cathode side of the cusp, but as the ions and electrons are scattered to the aperture side of the cusp, additional collisions create atomic ions. The increased electron path length allows for smaller diameters and lower operating pressures.

Solenoid and monocusp ion source

DOEpatents

Brainard, J.P.; Burns, E.J.T.; Draper, C.H.

1997-10-07

An ion source which generates hydrogen ions having high atomic purity incorporates a solenoidal permanent magnets to increase the electron path length. In a sealed envelope, electrons emitted from a cathode traverse the magnetic field lines of a solenoid and a monocusp magnet between the cathode and a reflector at the monocusp. As electrons collide with gas, the molecular gas forms a plasma. An anode grazes the outer boundary of the plasma. Molecular ions and high energy electrons remain substantially on the cathode side of the cusp, but as the ions and electrons are scattered to the aperture side of the cusp, additional collisions create atomic ions. The increased electron path length allows for smaller diameters and lower operating pressures. 6 figs.

Beam current controller for laser ion source

DOEpatents

Okamura, Masahiro

2014-10-28

The present invention relates to the design and use of an ion source with a rapid beam current controller for experimental and medicinal purposes. More particularly, the present invention relates to the design and use of a laser ion source with a magnetic field applied to confine a plasma flux caused by laser ablation.

Development of C6+ laser ion source and RFQ linac for carbon ion radiotherapy

NASA Astrophysics Data System (ADS)

Sako, T.; Yamaguchi, A.; Sato, K.; Goto, A.; Iwai, T.; Nayuki, T.; Nemoto, K.; Kayama, T.; Takeuchi, T.

2016-02-01

A prototype C6+ injector using a laser ion source has been developed for a compact synchrotron dedicated to carbon ion radiotherapy. The injector consists of a laser ion source and a 4-vane radio-frequency quadrupole (RFQ) linac. Ion beams are extracted from plasma and directly injected into the RFQ. A solenoid guides the low-energy beams into the RFQ. The RFQ is designed to accelerate high-intensity pulsed beams. A structure of monolithic vanes and cavities is adopted to reduce its power consumption. In beam acceleration tests, a solenoidal magnetic field set between the laser ion source and the RFQ helped increase both the peak currents before and after the RFQ by a factor of 4.

Low-temperature formation of c-axis-oriented aluminum nitride thin films by plasma-assisted reactive pulsed-DC magnetron sputtering

NASA Astrophysics Data System (ADS)

Takenaka, Kosuke; Satake, Yoshikatsu; Uchida, Giichiro; Setsuhara, Yuichi

2018-01-01

The low-temperature formation of c-axis-oriented aluminum nitride thin films was demonstrated by plasma-assisted reactive pulsed-DC magnetron sputtering. The effects of the duty cycle at the pulsed-DC voltage applied to the Al target on the properties of AlN films formed via inductively coupled plasma (ICP)-enhanced pulsed-DC magnetron sputtering deposition were investigated. With decreasing duty cycle at the target voltage, the peak intensity of AlN(0002) increased linearly. The surface roughness of AlN films decreased since there was an increase in film density owing to the impact of energetic ions on the films together with the enhancement of nitriding associated with the relative increase in N radical flux. The improvement of both the crystallinity and surface morphology of AlN films at low temperatures is considered to be caused by the difference between the relative flux values of ions and sputtered atoms.

Plasma Ion Sources for Atmospheric Pressure Ionization Mass Spectrometry.

NASA Astrophysics Data System (ADS)

Zhao, Jian-Guo

1994-01-01

Atmospheric pressure ionization (API) sources using direct-current (DC) and radio-frequency (RF) plasma have been developed in this thesis work. These ion sources can provide stable discharge currents of ~ 1 mA, 2-3 orders of magnitude larger than that of the corona discharge, a widely used API source. The plasmas can be generated and maintained in 1 atm of various buffer gases by applying -500 to -1000 V (DC plasma) or 1-15 W with a frequency of 165 kHz (RF plasma) on the needle electrode. These ion sources have been used with liquid injection to detect various organic compounds of pharmaceutical, biotechnological and environmental interest. Key features of these ion sources include soft ionization with the protonated molecule as the largest peak, and superb sensitivity with detection limits in the low picogram or femtomole range and a linear dynamic range over ~4 orders of magnitude. The RF plasma has advantages over the DC plasma in its ability to operate in various buffer gases and to produce a more stable plasma. Factors influencing the performance of the ion sources have been studied, including RF power level, liquid flow rate, chamber temperature, solvent composition, and voltage affecting the collision induced dissociation (CID). Ionization of hydrocarbons by the RF plasma API source was also studied. Soft ionization is generally produced. To obtain high sensitivity, the ion source must be very dry and the needle-to-orifice distance must be small. Nitric oxide was used to enhance the sensitivity. The RF plasma source was then used for the analysis of hydrocarbons in auto emissions. Comparisons between the corona discharge and the RF plasma have been made in terms of discharge current, ion residence time, and the ion source model. The RF plasma source provides larger linear dynamic range and higher sensitivity than the corona discharge, due to its much larger discharge current. The RF plasma was also observed to provide longer ion residence times and was not

RF Negative Ion Source Development at IPP Garching

NASA Astrophysics Data System (ADS)

Kraus, W.; McNeely, P.; Berger, M.; Christ-Koch, S.; Falter, H. D.; Fantz, U.; Franzen, P.; Fröschle, M.; Heinemann, B.; Leyer, S.; Riedl, R.; Speth, E.; Wünderlich, D.

2007-08-01

IPP Garching is heavily involved in the development of an ion source for Neutral Beam Heating of the ITER Tokamak. RF driven ion sources have been successfully developed and are in operation on the ASDEX-Upgrade Tokamak for positive ion based NBH by the NB Heating group at IPP Garching. Building on this experience a RF driven H- ion source has been under development at IPP Garching as an alternative to the ITER reference design ion source. The number of test beds devoted to source development for ITER has increased from one (BATMAN) by the addition of two test beds (MANITU, RADI). This paper contains descriptions of the three test beds. Results on diagnostic development using laser photodetachment and cavity ringdown spectroscopy are given for BATMAN. The latest results for long pulse development on MANITU are presented including the to date longest pulse (600 s). As well, details of source modifications necessitated for pulses in excess of 100 s are given. The newest test bed RADI is still being commissioned and only technical details of the test bed are included in this paper. The final topic of the paper is an investigation into the effects of biasing the plasma grid.

CALUTRON ION SOURCE

DOEpatents

Oppenheimer, F.

1958-08-19

The construction of an ion source is descrtbed wherein a uniform and elongated arc is established for employment in a calutron. The novel features of the . source include the positioning of a cathode at one end of an elongated extt slit of an arc chamber. and anode electrodes defintng the longitudinal margins of the exit opening. When the exit slit is orientated in a parallel relation to a magnetic field, the arc extends in the direction of the magnetic field along and between the anode electrodes, which are held at a positsve potential with respect to the cathode.

Diamond-like carbon prepared by pulsed laser deposition with ion bombardment: physical properties

NASA Astrophysics Data System (ADS)

Písařík, P.; Mikšovský, J.; Remsa, J.; Zemek, J.; Tolde, Z.; Jelínek, M.

2018-01-01

Diamond-like carbon (DLC) and titanium-doped DLC thin films were prepared by unique hybrid system consisting of pulsed laser deposition, ion source (bombardment) and magnetron sputtering. The influence of deposition parameters (ion energies, deposition pressures and magnetron power) on composition and physical properties was studied. Composition and sp 3/ sp 2 ratio were determined by XPS. sp 3/ sp 2 ratio was in the range from 1.4 to 2.2 for undoped DLC and from 3.4 to 4.8 for Ti-DLC. AFM showed that the layers were smooth, but with small amounts of random droplets. The measurements of the contact angle and determination of surface free energy were made for water, diiodomethane and ethylene glycol. Hardness and reduced Young's modulus varied from 20 to 31 GPa and from 182 to 276 GPa, respectively. Film adhesion was determined by scratch test; L C3 reached 23 N for DLC and 27 N for TiDLC. Optimization of sp 3/ sp 2 ratio, hardness and adhesion to biomedical alloys will advance the DLC coatings usability in the field of implantology.

Neutralization of an ion beam from the end-Hall ion source by a plasma electron source based on a discharge in crossed E × H fields

NASA Astrophysics Data System (ADS)

Dostanko, A. P.; Golosov, D. A.

2009-10-01

The possibility of using a plasma electron source (PES) with a discharge in crossed E × H field for compensating the ion beam from an end-Hall ion source (EHIS) is analyzed. The PES used as a neutralizer is mounted in the immediate vicinity of the EHIS ion generation and acceleration region at 90° to the source axis. The behavior of the discharge and emission parameters of the EHIS is determined for operation with a filament neutralizer and a plasma electron source. It is found that the maximal discharge current from the ion source attains a value of 3.8 A for operation with a PES and 4 A for operation with a filament compensator. It is established that the maximal discharge current for the ion source strongly depends on the working gas flow rate for low flow rates (up to 10 ml/min) in the EHIS; for higher flow rates, the maximum discharge current in the EHIS depends only on the emissivity of the PES. Analysis of the emission parameters of EHISs with filament and plasma neutralizers shows that the ion beam current and the ion current density distribution profile are independent of the type of the electron source and the ion current density can be as high as 0.2 mA/cm2 at a distance of 25 cm from the EHIS anode. The balance of currents in the ion source-electron source system is considered on the basis of analysis of operation of EHISs with various sources of electrons. It is concluded that the neutralization current required for operation of an ion source in the discharge compensation mode must be equal to or larger than the discharge current of the ion source. The use of PES for compensating the ion beam from an end-Hall ion source proved to be effective in processes of ion-assisted deposition of thin films using reactive gases like O2 or N2. The application of the PES technique makes it possible to increase the lifetime of the ion-assisted deposition system by an order of magnitude (the lifetime with a Ti cathode is at least 60 h and is limited by the

A negative ion source test facility

NASA Astrophysics Data System (ADS)

Melanson, S.; Dehnel, M.; Potkins, D.; Theroux, J.; Hollinger, C.; Martin, J.; Philpott, C.; Stewart, T.; Jackle, P.; Williams, P.; Brown, S.; Jones, T.; Coad, B.; Withington, S.

2016-02-01

Progress is being made in the development of an Ion Source Test Facility (ISTF) by D-Pace Inc. in collaboration with Buckley Systems Ltd. in Auckland, NZ. The first phase of the ISTF is to be commissioned in October 2015 with the second phase being commissioned in March 2016. The facility will primarily be used for the development and the commercialization of ion sources. It will also be used to characterize and further develop various D-Pace Inc. beam diagnostic devices.

The ionization length in plasmas with finite temperature ion sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Jelic, N.; Kos, L.; Duhovnik, J.

2009-12-15

The ionization length is an important quantity which up to now has been precisely determined only in plasmas which assume that the ions are born at rest, i.e., in discharges known as 'cold ion-source' plasmas. Presented here are the results of our calculations of the ionization lengths in plasmas with an arbitrary ion source temperature. Harrison and Thompson (H and T) [Proc. Phys. Soc. 74, 145 (1959)] found the values of this quantity for the cases of several ion strength potential profiles in the well-known Tonks-Langmuir [Phys. Rev. 34, 876 (1929)] discharge, which is characterized by 'cold' ion temperature. Thismore » scenario is also known as the 'singular' ion-source discharge. The H and T analytic result covers cases of ion sources proportional to exp(betaPHI) with PHI the normalized plasma potential and beta=0,1,2 values, which correspond to particular physical scenarios. Many years following H and T's work, Bissell and Johnson (B and J) [Phys. Fluids 30, 779 (1987)] developed a model with the so-called 'warm' ion-source temperature, i.e., 'regular' ion source, under B and J's particular assumption that the ionization strength is proportional to the local electron density. However, it appears that B and J were not interested in determining the ionization length at all. The importance of this quantity to theoretical modeling was recognized by Riemann, who recently answered all the questions of the most advanced up-to-date plasma-sheath boundary theory with cold ions [K.-U. Riemann, Phys. Plasmas 13, 063508 (2006)] but still without the stiff warm ion-source case solution, which is highly resistant to solution via any available analytic method. The present article is an extension of H and T's results obtained for a single point only with ion source temperature T{sub n}=0 to arbitrary finite ion source temperatures. The approach applied in this work is based on the method recently developed by Kos et al. [Phys. Plasmas 16, 093503 (2009)].« less

Computer Modeling of High-Intensity Cs-Sputter Ion Sources

NASA Astrophysics Data System (ADS)

Brown, T. A.; Roberts, M. L.; Southon, J. R.

The grid-point mesh program NEDLab has been used to computer model the interior of the high-intensity Cs-sputter source used in routine operations at the Center for Accelerator Mass Spectrometry (CAMS), with the goal of improving negative ion output. NEDLab has several features that are important to realistic modeling of such sources. First, space-charge effects are incorporated in the calculations through an automated ion-trajectories/Poissonelectric-fields successive-iteration process. Second, space charge distributions can be averaged over successive iterations to suppress model instabilities. Third, space charge constraints on ion emission from surfaces can be incorporate under Child's Law based algorithms. Fourth, the energy of ions emitted from a surface can be randomly chosen from within a thermal energy distribution. And finally, ions can be emitted from a surface at randomized angles The results of our modeling effort indicate that significant modification of the interior geometry of the source will double Cs+ ion production from our spherical ionizer and produce a significant increase in negative ion output from the source.

Ion source and injection line for high intensity medical cyclotron

DOE Office of Scientific and Technical Information (OSTI.GOV)

Jia, XianLu, E-mail: jiaxl@ciae.ac.cn; Guan, Fengping; Yao, Hongjuan

2014-02-15

A 14 MeV high intensity compact cyclotron, CYCIAE-14, was built at China Institute of Atomic Energy (CIAE). An injection system based on the external H− ion source was used on CYCIAE-14 so as to provide high intensity beam, while most positron emission tomography cyclotrons adopt internal ion source. A beam intensity of 100 μA/14 MeV was extracted from the cyclotron with a small multi-cusp H− ion source (CIAE-CH-I type) and a short injection line, which the H− ion source of 3 mA/25 keV H− beam with emittance of 0.3π mm mrad and the injection line of with only 1.2 m from themore » extraction of ion source to the medial plane of the cyclotron. To increase the extracted beam intensity of the cyclotron, a new ion source (CIAE-CH-II type) of 9.1 mA was used, with maximum of 500 μA was achieved from the cyclotron. The design and test results of the ion source and injection line optimized for high intensity acceleration will be given in this paper.« less

An electron cyclotron resonance ion source based low energy ion beam platform.

PubMed

Sun, L T; Shang, Y; Ma, B H; Zhang, X Z; Feng, Y C; Li, X X; Wang, H; Guo, X H; Song, M T; Zhao, H Y; Zhang, Z M; Zhao, H W; Xie, D Z

2008-02-01

To satisfy the requirements of surface and atomic physics study in the field of low energy multiple charge state ion incident experiments, a low energy (10 eV/q-20 keV/q) ion beam platform is under design at IMP. A simple test bench has been set up to test the ion beam deceleration systems. Considering virtues such as structure simplicity, easy handling, compactness, cost saving, etc., an all-permanent magnet ECRIS LAPECR1 [Lanzhou all-permanent magnet electron cyclotron resonance (ECR) ion source No. 1] working at 14.5 GHz has been adopted to produce intense medium and low charge state ion beams. LAPECR1 source has already been ignited. Some intense low charge state ion beams have been produced on it, but the first test also reveals that many problems are existing on the ion beam transmission line. The ion beam transmission mismatches result in the depressed performance of LAPECR1, which will be discussed in this paper. To obtain ultralow energy ion beam, after being analyzed by a double-focusing analyzer magnet, the selected ion beam will be further decelerated by two afocal deceleration lens systems, which is still under design. This design has taken into consideration both ions slowing down and also ion beam focusing. In this paper, the conceptual design of deceleration system will be discussed.

Low energy ion beam dynamics of NANOGAN ECR ion source

NASA Astrophysics Data System (ADS)

Kumar, Sarvesh; Mandal, A.

2016-04-01

A new low energy ion beam facility (LEIBF) has been developed for providing the mass analyzed highly charged intense ion beams of energy ranging from a few tens of keV to a few MeV for atomic, molecular and materials sciences research. The new facility consists of an all permanent magnet 10 GHz electron cyclotron resonance (ECR) ion source (NANOGAN) installed on a high voltage platform (400 kV) which provides large currents of multiply charged ion beams. Higher emittance at low energy of intense ion beam puts a tremendous challenge to the beam optical design of this facility. The beam line consists of mainly the electrostatic quadrupoles, an accelerating section, analyzing cum switching magnet and suitable beam diagnostics including vacuum components. The accelerated ion beam is analyzed for a particular mass to charge (m/q) ratio as well as guided to three different lines along 75°, 90° and 105° using a large acceptance analyzing cum switching magnet. The details of transverse beam optics to all the beam lines with TRANSPORT and GICOSY beam optics codes are being described. Field computation code, OPERA 3D has been utilized to design the magnets and electrostatic quadrupoles. A theoretical estimation of emittance for optimized geometry of ion source is given so as to form the basis of beam optics calculations. The method of quadrupole scan of the beam is used to characterize the emittance of the final beam on the target. The measured beam emittance increases with m/q ratios of various ion beams similar to the trend observed theoretically.

Performance test of electron cyclotron resonance ion sources for the Hyogo Ion Beam Medical Center

NASA Astrophysics Data System (ADS)

Sawada, K.; Sawada, J.; Sakata, T.; Uno, K.; Okanishi, K.; Harada, H.; Itano, A.; Higashi, A.; Akagi, T.; Yamada, S.; Noda, K.; Torikoshi, M.; Kitagawa, A.

2000-02-01

Two electron cyclotron resonance (ECR) ion sources were manufactured for the accelerator facility at the Hyogo Ion Beam Medical Center. H2+, He2+, and C4+ were chosen as the accelerating ions because they have the highest charge to mass ratio among ion states which satisfy the required intensity and quality. The sources have the same structure as the 10 GHz ECR source at the Heavy Ion Medical Accelerator in Chiba except for a few improvements in the magnetic structure. Their performance was investigated at the Sumitomo Heavy Industries factory before shipment. The maximum intensity was 1500 μA for H2+, 1320 μA for He2+, and 580 μA for C4+ at the end of the ion source beam transport line. These are several times higher than required. Sufficient performance was also observed in the flatness and long-term stability of the pulsed beams. These test results satisfy the requirements for medical use.

High brilliance negative ion and neutral beam source

DOEpatents

Compton, Robert N.

1991-01-01

A high brilliance mass selected (Z-selected) negative ion and neutral beam source having good energy resolution. The source is based upon laser resonance ionization of atoms or molecules in a small gaseous medium followed by charge exchange through an alkali oven. The source is capable of producing microampere beams of an extremely wide variety of negative ions, and milliampere beams when operated in the pulsed mode.

Modeling and experimental studies of a side band power re-injection locked magnetron

NASA Astrophysics Data System (ADS)

Ye, Wen-Jun; Zhang, Yi; Yuan, Ping; Zhu, Hua-Cheng; Huang, Ka-Ma; Yang, Yang

2016-12-01

A side band power re-injection locked (SBPRIL) magnetron is presented in this paper. A tuning stub is placed between the external injection locked (EIL) magnetron and the circulator. Side band power of the EIL magnetron is reflected back to the magnetron. The reflected side band power is reused and pulled back to the central frequency. A phase-locking model is developed from circuit theory to explain the process of reuse of side band power in SBPRIL magnetron. Theoretical analysis proves that the side band power is pulled back to the central frequency of the SBPRIL magnetron, then the amplitude of the RF voltage increases and the phase noise performance is improved. Particle-in-cell (PIC) simulation of a 10-vane continuous wave (CW) magnetron model is presented. Computer simulation predicts that the frequency spectrum’s peak of the SBPRIL magnetron has an increase of 3.25 dB compared with the free running magnetron. The phase noise performance at the side band offset reduces 12.05 dB for the SBPRIL magnetron. Besides, the SBPRIL magnetron experiment is presented. Experimental results show that the spectrum peak rises by 14.29% for SBPRIL magnetron compared with the free running magnetron. The phase noise reduces more than 25 dB at 45-kHz offset compared with the free running magnetron. Project supported by the National Basic Research Program of China (Grant No. 2013CB328902) and the National Natural Science Foundation of China (Grant No. 61501311).

Pseudo ribbon metal ion beam source.

PubMed

Stepanov, Igor B; Ryabchikov, Alexander I; Sivin, Denis O; Verigin, Dan A

2014-02-01

The paper describes high broad metal ion source based on dc macroparticle filtered vacuum arc plasma generation with the dc ion-beam extraction. The possibility of formation of pseudo ribbon beam of metal ions with the parameters: ion beam length 0.6 m, ion current up to 0.2 A, accelerating voltage 40 kV, and ion energy up to 160 kV has been demonstrated. The pseudo ribbon ion beam is formed from dc vacuum arc plasma. The results of investigation of the vacuum arc evaporator ion-emission properties are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ion-emission properties of vacuum-arc discharge for different cathode materials are determined. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.

Alternative modeling methods for plasma-based Rf ion sources.

PubMed

Veitzer, Seth A; Kundrapu, Madhusudhan; Stoltz, Peter H; Beckwith, Kristian R C

2016-02-01

Rf-driven ion sources for accelerators and many industrial applications benefit from detailed numerical modeling and simulation of plasma characteristics. For instance, modeling of the Spallation Neutron Source (SNS) internal antenna H(-) source has indicated that a large plasma velocity is induced near bends in the antenna where structural failures are often observed. This could lead to improved designs and ion source performance based on simulation and modeling. However, there are significant separations of time and spatial scales inherent to Rf-driven plasma ion sources, which makes it difficult to model ion sources with explicit, kinetic Particle-In-Cell (PIC) simulation codes. In particular, if both electron and ion motions are to be explicitly modeled, then the simulation time step must be very small, and total simulation times must be large enough to capture the evolution of the plasma ions, as well as extending over many Rf periods. Additional physics processes such as plasma chemistry and surface effects such as secondary electron emission increase the computational requirements in such a way that even fully parallel explicit PIC models cannot be used. One alternative method is to develop fluid-based codes coupled with electromagnetics in order to model ion sources. Time-domain fluid models can simulate plasma evolution, plasma chemistry, and surface physics models with reasonable computational resources by not explicitly resolving electron motions, which thereby leads to an increase in the time step. This is achieved by solving fluid motions coupled with electromagnetics using reduced-physics models, such as single-temperature magnetohydrodynamics (MHD), extended, gas dynamic, and Hall MHD, and two-fluid MHD models. We show recent results on modeling the internal antenna H(-) ion source for the SNS at Oak Ridge National Laboratory using the fluid plasma modeling code USim. We compare demonstrate plasma temperature equilibration in two-temperature MHD

Development of C⁶⁺ laser ion source and RFQ linac for carbon ion radiotherapy.

PubMed

Sako, T; Yamaguchi, A; Sato, K; Goto, A; Iwai, T; Nayuki, T; Nemoto, K; Kayama, T; Takeuchi, T

2016-02-01

A prototype C(6+) injector using a laser ion source has been developed for a compact synchrotron dedicated to carbon ion radiotherapy. The injector consists of a laser ion source and a 4-vane radio-frequency quadrupole (RFQ) linac. Ion beams are extracted from plasma and directly injected into the RFQ. A solenoid guides the low-energy beams into the RFQ. The RFQ is designed to accelerate high-intensity pulsed beams. A structure of monolithic vanes and cavities is adopted to reduce its power consumption. In beam acceleration tests, a solenoidal magnetic field set between the laser ion source and the RFQ helped increase both the peak currents before and after the RFQ by a factor of 4.

Operation Status of the J-PARC Negative Hydrogen Ion Source

NASA Astrophysics Data System (ADS)

Oguri, H.; Ikegami, K.; Ohkoshi, K.; Namekawa, Y.; Ueno, A.

2011-09-01

A cesium-free negative hydrogen ion source driven with a lanthanum hexaboride (LaB6) filament is being operated without any serious trouble for approximately four years in J-PARC. Although the ion source is capable of producing an H- ion current of more than 30 mA, the current is routinely restricted to approximately 16 mA at present for the stable operation of the RFQ linac which has serious discharge problem from September 2008. The beam run is performed during 1 month cycle, which consisted of a 4-5 weeks beam operation and a few days down-period interval. At the recent beam run, approximately 700 h continuous operation was achieved. At every runs, the beam interruption time due to the ion source failure is a few hours, which correspond to the ion source availability of more than 99%. The R&D work is being performed in parallel with the operation in order to enhance the further beam current. As a result, the H- ion current of 61 mA with normalized rms emittance of 0.26 πmm.mrad was obtained by adding a cesium seeding system to a J-PARC test ion source which has the almost same structure with the present J-PARC ion source.

A review of ion sources for medical accelerators (invited)

DOE Office of Scientific and Technical Information (OSTI.GOV)

Muramatsu, M.; Kitagawa, A.

2012-02-15

There are two major medical applications of ion accelerators. One is a production of short-lived isotopes for radionuclide imaging with positron emission tomography and single photon emission computer tomography. Generally, a combination of a source for negative ions (usually H- and/or D-) and a cyclotron is used; this system is well established and distributed over the world. Other important medical application is charged-particle radiotherapy, where the accelerated ion beam itself is being used for patient treatment. Two distinctly different methods are being applied: either with protons or with heavy-ions (mostly carbon ions). Proton radiotherapy for deep-seated tumors has become widespreadmore » since the 1990s. The energy and intensity are typically over 200 MeV and several 10{sup 10} pps, respectively. Cyclotrons as well as synchrotrons are utilized. The ion source for the cyclotron is generally similar to the type for production of radioisotopes. For a synchrotron, one applies a positive ion source in combination with an injector linac. Carbon ion radiotherapy awakens a worldwide interest. About 6000 cancer patients have already been treated with carbon beams from the Heavy Ion Medical Accelerator in Chiba at the National Institute of Radiological Sciences in Japan. These clinical results have clearly verified the advantages of carbon ions. Heidelberg Ion Therapy Center and Gunma University Heavy Ion Medical Center have been successfully launched. Several new facilities are under commissioning or construction. The beam energy is adjusted to the depth of tumors. It is usually between 140 and 430 MeV/u. Although the beam intensity depends on the irradiation method, it is typically several 10{sup 8} or 10{sup 9} pps. Synchrotrons are only utilized for carbon ion radiotherapy. An ECR ion source supplies multi-charged carbon ions for this requirement. Some other medical applications with ion beams attract developer's interests. For example, the several types of

Caesium sputter ion source compatible with commercial SIMS instruments

NASA Astrophysics Data System (ADS)

Belykh, S. F.; Palitsin, V. V.; Veryovkin, I. V.; Kovarsky, A. P.; Chang, R. J. H.; Adriaens, A.; Dowsett, M.; Adams, F.

2006-07-01

A simple design for a caesium sputter cluster ion source compatible with commercially available secondary ion mass spectrometers is reported. This source has been tested with the Cameca IMS 4f instrument using the cluster Si n- and Cu n- ions, and will shortly be retrofitted to the floating low energy ion gun (FLIG) of the type used on the Cameca 4500/4550 quadruple instruments. Our experiments with surface characterization and depth profiling conducted to date demonstrate improvements of analytical capabilities of the SIMS instrument due to the non-additive enhancement of secondary ion emission and shorter ion ranges of polyatomic projectiles compared to atomic ions with the same impact energy.

Development of Compact Electron Cyclotron Resonance Ion Source with Permanent Magnets for High-Energy Carbon-Ion Therapy

NASA Astrophysics Data System (ADS)

Muramatsu, M.; Kitagawa, A.; Iwata, Y.; Hojo, S.; Sakamoto, Y.; Sato, S.; Ogawa, Hirotsugu; Yamada, S.; Ogawa, Hiroyuki; Yoshida, Y.; Ueda, T.; Miyazaki, H.; Drentje, A. G.

2008-11-01

Heavy-ion cancer treatment is being carried out at the Heavy Ion Medical Accelerator in Chiba (HIMAC) with 140 to 400 MeV/n carbon ions at National Institute of Radiological Sciences (NIRS) since 1994. At NIRS, more than 4,000 patients have been treated, and the clinical efficiency of carbon ion radiotherapy has been demonstrated for many diseases. A more compact accelerator facility for cancer therapy is now being constricted at the Gunma University. In order to reduce the size of the injector (consists of ion source, low-energy beam transport and post-accelerator Linac include these power supply and cooling system), an ion source requires production of highly charged carbon ions, lower electric power for easy installation of the source on a high-voltage platform, long lifetime and easy operation. A compact Electron Cyclotron Resonance Ion Source (ECRIS) with all permanent magnets is one of the best types for this purpose. An ECRIS has advantage for production of highly charged ions. A permanent magnet is suitable for reduce the electric power and cooling system. For this, a 10 GHz compact ECRIS with all permanent magnets (Kei2-source) was developed. The maximum mirror magnetic fields on the beam axis are 0.59 T at the extraction side and 0.87 T at the gas-injection side, while the minimum B strength is 0.25 T. These parameters have been optimized for the production of C4+ based on experience at the 10 GHz NIRS-ECR ion source. The Kei2-source has a diameter of 320 mm and a length of 295 mm. The beam intensity of C4+ was obtained to be 618 eμA under an extraction voltage of 30 kV. Outline of the heavy ion therapy and development of the compact ion source for new facility are described in this paper.

A 5 x 40 cm rectangular-beam multipole ion source

NASA Technical Reports Server (NTRS)

Robinson, R. S.; Kaufman, H. R.; Haynes, C. M.

1981-01-01

A rectangular ion source particularly suited for the continuous sputter processing of materials over a wide area is discussed. A multipole magnetic field configuration was used to design an ion source with a 5 x 40 cm beam area, while a three-grid ion optics system was used to maximize ion current density at the design ion energy of 500 eV. An average extracted current density of about 4 mA/sq cm could be obtained from 500 eV Ar ions. The difference between the experimental performance and the design value of 6 mA/sq cm is attributed to grid misalignment due to thermal expansion. The discharge losses at typical operating conditions ranged from about 600 to 1000 eV/ion, in reasonable agreement with the design value of 800 eV/ion. The use of multiple rectangular-beam ion sources to process wider areas than would be possible with a single source was also studied, and the most uniform coverage was found to be obtainable with a 0 to 2 cm overlap.

Bright focused ion beam sources based on laser-cooled atoms

PubMed Central

McClelland, J. J.; Steele, A. V.; Knuffman, B.; Twedt, K. A.; Schwarzkopf, A.; Wilson, T. M.

2016-01-01

Nanoscale focused ion beams (FIBs) represent one of the most useful tools in nanotechnology, enabling nanofabrication via milling and gas-assisted deposition, microscopy and microanalysis, and selective, spatially resolved doping of materials. Recently, a new type of FIB source has emerged, which uses ionization of laser cooled neutral atoms to produce the ion beam. The extremely cold temperatures attainable with laser cooling (in the range of 100 μK or below) result in a beam of ions with a very small transverse velocity distribution. This corresponds to a source with extremely high brightness that rivals or may even exceed the brightness of the industry standard Ga+ liquid metal ion source. In this review we discuss the context of ion beam technology in which these new ion sources can play a role, their principles of operation, and some examples of recent demonstrations. The field is relatively new, so only a few applications have been demonstrated, most notably low energy ion microscopy with Li ions. Nevertheless, a number of promising new approaches have been proposed and/or demonstrated, suggesting that a rapid evolution of this type of source is likely in the near future. PMID:27239245

Bright focused ion beam sources based on laser-cooled atoms

DOE Office of Scientific and Technical Information (OSTI.GOV)

McClelland, J. J.; Wilson, T. M.; Steele, A. V.

2016-03-15

Nanoscale focused ion beams (FIBs) represent one of the most useful tools in nanotechnology, enabling nanofabrication via milling and gas-assisted deposition, microscopy and microanalysis, and selective, spatially resolved doping of materials. Recently, a new type of FIB source has emerged, which uses ionization of laser cooled neutral atoms to produce the ion beam. The extremely cold temperatures attainable with laser cooling (in the range of 100 μK or below) result in a beam of ions with a very small transverse velocity distribution. This corresponds to a source with extremely high brightness that rivals or may even exceed the brightness of themore » industry standard Ga{sup +} liquid metal ion source. In this review, we discuss the context of ion beam technology in which these new ion sources can play a role, their principles of operation, and some examples of recent demonstrations. The field is relatively new, so only a few applications have been demonstrated, most notably low energy ion microscopy with Li ions. Nevertheless, a number of promising new approaches have been proposed and/or demonstrated, suggesting that a rapid evolution of this type of source is likely in the near future.« less

Effect of different methods of preliminary surface treatment and magnetron sputtering on the adhesion of Si coatings

NASA Astrophysics Data System (ADS)

Borisov, D. P.; Slabodchikov, V. A.; Kuznetsov, V. M.

2017-05-01

The paper presents research results on the adhesion of Si coatings deposited by magnetron sputtering on NiTi substrates after preliminary surface treatment (cleaning and activation) with low-energy ion beams and gas discharge plasma. The adhesion properties of the coatings obtained by two methods are analyzed and compared using data of scratch and spherical abrasion tests.

Simulations of negative hydrogen ion sources

NASA Astrophysics Data System (ADS)

Demerdjiev, A.; Goutev, N.; Tonev, D.

2018-05-01

The development and the optimisation of negative hydrogen/deuterium ion sources goes hand in hand with modelling. In this paper a brief introduction on the physics and types of different sources, and on the Kinetic and Fluid theories for plasma description is made. Examples of some recent models are considered whereas the main emphasis is on the model behind the concept and design of a matrix source of negative hydrogen ions. At the Institute for Nuclear Research and Nuclear Energy of the Bulgarian Academy of Sciences a new cyclotron center is under construction which opens new opportunities for research. One of them is the development of plasma sources for additional proton beam acceleration. We have applied the modelling technique implemented in the aforementioned model of the matrix source to a microwave plasma source exemplifying a plasma filled array of cavities made of a dielectric material with high permittivity. Preliminary results for the distribution of the plasma parameters and the φ component of the electric field in the plasma are obtained.

Magnetron sputtered boron films

DOEpatents

Makowiecki, Daniel M.; Jankowski, Alan F.

1998-01-01

A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.

Magnetron sputtered boron films

DOEpatents

Makowiecki, D.M.; Jankowski, A.F.

1998-06-16

A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence. 8 figs.

Power Transmission From The ITER Model Negative Ion Source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Boilson, D.; Esch, H. P. L. de; Grand, C.

2007-08-10

In Cadarache development on negative ion sources is being carried out on the KAMABOKO III ion source on the MANTIS test bed. This is a model of the ion source designed for the neutral beam injectors of ITER. This ion source has been developed in collaboration with JAERI, Japan, who also designed and supplied the ion source. Its target performance is to accelerate a D- beam, with a current density of 200 A/m2 and <1 electron extracted per accelerated D- ion, at a source filling pressure of 0.3 Pa. For ITER a continuous ion beam must be assured for pulsemore » lengths of 1000 s, but beams of up to 3,600 s are also envisaged. The ion source is attached to a 3 grid 30 keV accelerator (also supplied by JAERI) and the accelerated negative ion current is determined from the energy deposited on a calorimeter. During long pulse operation ({<=}1000 s) it was found that the current density of both D- and H- beams, measured at the calorimeter was lower than expected and that a large discrepancy existed between the accelerated currents measured electrically and those transmitted to the calorimeter. The possibility that this discrepancy arose because the accelerated current included electrons (which would not be able to reach the calorimeter) was investigated and subsequently eliminated. Further studies have shown that the fraction of the electrical current reaching the calorimeter varies with the pulse length, which led to the suggestion that one or more of the accelerator grids were distorting due to the incident power during operation, leading to a progressive deterioration in the beam quality.. New extraction and acceleration grids have been designed and installed, which should have a better tolerance to thermal loads than those previously used. This paper describes the measurements of the power transmission and distribution using these grids.« less

Overview of ion source characterization diagnostics in INTF

NASA Astrophysics Data System (ADS)

Bandyopadhyay, M.; Sudhir, Dass; Bhuyan, M.; Soni, J.; Tyagi, H.; Joshi, J.; Yadav, A.; Rotti, C.; Parmar, Deepak; Patel, H.; Pillai, S.; Chakraborty, A.

2016-02-01

INdian Test Facility (INTF) is envisaged to characterize ITER diagnostic neutral beam system and to establish the functionality of its eight inductively coupled RF plasma driver based negative hydrogen ion source and its beamline components. The beam quality mainly depends on the ion source performance and therefore, its diagnostics plays an important role for its safe and optimized operation. A number of diagnostics are planned in INTF to characterize the ion source performance. Negative ions and its cesium contents in the source will be monitored by optical emission spectroscopy (OES) and cavity ring down spectroscopy. Plasma near the extraction region will be studied using standard electrostatic probes. The beam divergence and negative ion stripping losses are planned to be measured using Doppler shift spectroscopy. During initial phase of ion beam characterization, carbon fiber composite based infrared imaging diagnostics will be used. Safe operation of the beam will be ensured by using standard thermocouples and electrical voltage-current measurement sensors. A novel concept, based on plasma density dependent plasma impedance measurement using RF electrical impedance matching parameters to characterize the RF driver plasma, will be tested in INTF and will be validated with OES data. The paper will discuss about the overview of the complete INTF diagnostics including its present status of procurement, experimentation, interface with mechanical systems in INTF, and integration with INTF data acquisition and control systems.

Industrial ion source technology

NASA Technical Reports Server (NTRS)

Kaufman, H. R.; Robinson, R. S.

1978-01-01

An analytical model was developed to describe the development of a coned surface texture with ion bombardment and simultaneous deposition of an impurity. A mathematical model of sputter deposition rate from a beveled target was developed in conjuction with the texturing models to provide an important input to that model. The establishment of a general procedure that will allow the treatment of manay different sputtering configurations is outlined. Calculation of cross sections for energetic binary collisions was extened to Ar, Kr.. and Xe with total cross sections for viscosity and diffusion calculated for the interaction energy range from leV to 1000eV. Physical sputtering and reactive ion etching experiments provided experimental data on the operating limits of a broad beam ion source using CF4 as a working gas to produce reactive species in a sputtering beam. Magnetic clustering effects are observed when Al is seeded with Fe and sputtered with Ar(?) ions. Silicon was textured at a micron scale by using a substrate temperature of 600 C.

A CW radiofrequency ion source for production of negative hydrogen ion beams for cyclotrons

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kalvas, T.; Tarvainen, O.; Komppula, J.

2015-04-08

A CW 13.56 MHz radiofrequency-driven ion source RADIS for production of H{sup −} and D{sup −} beams is under development for replacing the filament-driven ion source of the MCC30/15 cyclotron. The RF ion source has a 16-pole multicusp plasma chamber, an electromagnet-based magnetic filter and an external planar spiral RF antenna behind an AlN window. The extraction is a 5-electrode system with an adjustable puller electrode voltage for optimizing the beam formation, a water-cooled electron dump electrode and an accelerating einzel lens. At 2650 W of RF power, the source produces 1 mA of H{sup −} (2.6 mA/cm{sup 2}), which is the intensity neededmore » at injection for production of 200 µA H{sup +} with the filament-driven ion source. A simple pepperpot device has been developed for characterizing the beam emittance. Plans for improving the power efficiency with the use of a new permanent magnet front plate is discussed.« less

Resonant interaction of the electron beam with a synchronous wave in controlled magnetrons for high-current superconducting accelerators

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kazakevich, G.; Johnson, R.; Lebedev, V.

A simplified analytical model of the resonant interaction of the beam of Larmor electrons drifting in the crossed constant fields of a magnetron with a synchronous wave providing a phase grouping of the drifting charge was developed to optimize the parameters of an rf resonant injected signal driving the magnetrons for management of phase and power of rf sources with a rate required for superconducting high-current accelerators. The model, which considers the impact of the rf resonant signal injected into the magnetron on the operation of the injection-locked tube, substantiates the recently developed method of fast power control of magnetronsmore » in the range up to 10 dB at the highest generation efficiency, with low noise, precise stability of the carrier frequency, and the possibility of wideband phase control. Experiments with continuous wave 2.45 GHz, 1 kW microwave oven magnetrons have verified the correspondence of the behavior of these tubes to the analytical model. A proof of the principle of the novel method of power control in magnetrons, based on the developed model, was demonstrated in the experiments. The method is attractive for high-current superconducting rf accelerators. This study also discusses vector methods of power control with the rates required for superconducting accelerators, the impact of the rf resonant signal injected into the magnetron on the rate of phase control of the injection-locked tubes, and a conceptual scheme of the magnetron transmitter with highest efficiency for high-current accelerators.« less

Resonant interaction of the electron beam with a synchronous wave in controlled magnetrons for high-current superconducting accelerators

DOE PAGES

Kazakevich, G.; Johnson, R.; Lebedev, V.; ...

2018-06-14

A simplified analytical model of the resonant interaction of the beam of Larmor electrons drifting in the crossed constant fields of a magnetron with a synchronous wave providing a phase grouping of the drifting charge was developed to optimize the parameters of an rf resonant injected signal driving the magnetrons for management of phase and power of rf sources with a rate required for superconducting high-current accelerators. The model, which considers the impact of the rf resonant signal injected into the magnetron on the operation of the injection-locked tube, substantiates the recently developed method of fast power control of magnetronsmore » in the range up to 10 dB at the highest generation efficiency, with low noise, precise stability of the carrier frequency, and the possibility of wideband phase control. Experiments with continuous wave 2.45 GHz, 1 kW microwave oven magnetrons have verified the correspondence of the behavior of these tubes to the analytical model. A proof of the principle of the novel method of power control in magnetrons, based on the developed model, was demonstrated in the experiments. The method is attractive for high-current superconducting rf accelerators. This study also discusses vector methods of power control with the rates required for superconducting accelerators, the impact of the rf resonant signal injected into the magnetron on the rate of phase control of the injection-locked tubes, and a conceptual scheme of the magnetron transmitter with highest efficiency for high-current accelerators.« less

A Penning sputter ion source with very low energy spread

NASA Astrophysics Data System (ADS)

Nouri, Z.; Li, R.; Holt, R. A.; Rosner, S. D.

2010-03-01

We have developed a version of the Frankfurt Penning ion source that produces ion beams with very low energy spreads of ˜3 eV, while operating in a new discharge mode characterized by very high pressure, low voltage, and high current. The extracted ions also comprise substantial metastable and doubly charged species. Detailed studies of the operating parameters of the source showed that careful adjustment of the magnetic field and gas pressure is critical to achieving optimum performance. We used a laser-fluorescence method of energy analysis to characterize the properties of the extracted ion beam with a resolving power of 1×10 4, and to measure the absolute ion beam energy to an accuracy of 4 eV in order to provide some insight into the distribution of plasma potential within the ion source. This characterization method is widely applicable to accelerator beams, though not universal. The low energy spread, coupled with the ability to produce intense ion beams from almost any gas or conducting solid, make this source very useful for high-resolution spectroscopic measurements on fast-ion beams.

Status of the laser ion source at IMP

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sha, S.; Graduate University of Chinese Academy of Sciences, Beijing 100049; School of Nuclear science and technology, Lanzhou University, Lanzhou 73000

2012-02-15

A laser (Nd:YAG laser, 3 J, 1064 nm, 8-10 ns) ion source has been built and under development at IMP to provide pulsed high-charge-state heavy ion beams to a radio frequency quadrupole (RFQ) for upgrading the IMP accelerators with a new low-energy beam injector. The laser ion source currently operates in a direct plasma injection scheme to inject the high charge state ions produced from a solid target into the RFQ. The maximum power density on the target was about 8.4 x 10{sup 12} W/cm{sup 2}. The preliminary experimental results will be presented and discussed in this paper.

RF Priming Experiments and Simulations of Magnetic Priming in Relativistic Magnetrons

NASA Astrophysics Data System (ADS)

White, W. M.; Gilgenbach, R. M.; Jones, M. C.; Neculaes, V. B.; Lau, Y. Y.; Jordan, N.; Pengvanich, P.; Edgar, R.; Hoff, B.; Spencer, T. A.; Price, D.

2004-11-01

We investigate 2 priming techniques in relativistic magnetrons for rapid startup and mode-locking: RF priming experiments with 0.1-1 MW from a 2nd magnetron; Magnetic-priming simulations by azimuthally-varying-axial magnetic field. Experiments utilize MELBA-C with a Titan 6-vane magnetron: V = -300kV, I = 1-10kA, e-beam T = 0.5 μs, microwave power = 100-500 MW, f= 1-1.3 GHz, base vacuum= 8.5 x 10-10 Torr. The AFRL RF priming magnetron is at 0.1-2 MW, 3 μsec, 1.27-1.32 GHz. About 0.2-0.3 MW is injected into 1 of 3 open coupling slots in the relativistic magnetron. Analysis of the relativistic magnetron's microwave output shows a clear effect of RF priming. Simulations of magnetic priming in the pi-mode are run in MAGIC code by imposing N/2 azimuthal-variations in the axial magnetic field of an N-vane magnetron. Faster startup and mode-locking are simulated by rapid-electron spoke formation and excitation of RF fields.

Alternative modeling methods for plasma-based Rf ion sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Veitzer, Seth A., E-mail: veitzer@txcorp.com; Kundrapu, Madhusudhan, E-mail: madhusnk@txcorp.com; Stoltz, Peter H., E-mail: phstoltz@txcorp.com

Rf-driven ion sources for accelerators and many industrial applications benefit from detailed numerical modeling and simulation of plasma characteristics. For instance, modeling of the Spallation Neutron Source (SNS) internal antenna H{sup −} source has indicated that a large plasma velocity is induced near bends in the antenna where structural failures are often observed. This could lead to improved designs and ion source performance based on simulation and modeling. However, there are significant separations of time and spatial scales inherent to Rf-driven plasma ion sources, which makes it difficult to model ion sources with explicit, kinetic Particle-In-Cell (PIC) simulation codes. Inmore » particular, if both electron and ion motions are to be explicitly modeled, then the simulation time step must be very small, and total simulation times must be large enough to capture the evolution of the plasma ions, as well as extending over many Rf periods. Additional physics processes such as plasma chemistry and surface effects such as secondary electron emission increase the computational requirements in such a way that even fully parallel explicit PIC models cannot be used. One alternative method is to develop fluid-based codes coupled with electromagnetics in order to model ion sources. Time-domain fluid models can simulate plasma evolution, plasma chemistry, and surface physics models with reasonable computational resources by not explicitly resolving electron motions, which thereby leads to an increase in the time step. This is achieved by solving fluid motions coupled with electromagnetics using reduced-physics models, such as single-temperature magnetohydrodynamics (MHD), extended, gas dynamic, and Hall MHD, and two-fluid MHD models. We show recent results on modeling the internal antenna H{sup −} ion source for the SNS at Oak Ridge National Laboratory using the fluid plasma modeling code USim. We compare demonstrate plasma temperature equilibration in two

Shutterless ion mobility spectrometer with fast pulsed electron source

NASA Astrophysics Data System (ADS)

Bunert, E.; Heptner, A.; Reinecke, T.; Kirk, A. T.; Zimmermann, S.

2017-02-01

Ion mobility spectrometers (IMS) are devices for fast and very sensitive trace gas analysis. The measuring principle is based on an initial ionization process of the target analyte. Most IMS employ radioactive electron sources, such as 63Ni or 3H. These radioactive materials have the disadvantage of legal restrictions and the electron emission has a predetermined intensity and cannot be controlled or disabled. In this work, we replaced the 3H source of our IMS with 100 mm drift tube length with our nonradioactive electron source, which generates comparable spectra to the 3H source. An advantage of our emission current controlled nonradioactive electron source is that it can operate in a fast pulsed mode with high electron intensities. By optimizing the geometric parameters and developing fast control electronics, we can achieve very short electron emission pulses for ionization with high intensities and an adjustable pulse width of down to a few nanoseconds. This results in small ion packets at simultaneously high ion densities, which are subsequently separated in the drift tube. Normally, the required small ion packet is generated by a complex ion shutter mechanism. By omitting the additional reaction chamber, the ion packet can be generated directly at the beginning of the drift tube by our pulsed nonradioactive electron source with only slight reduction in resolving power. Thus, the complex and costly shutter mechanism and its electronics can also be omitted, which leads to a simple low-cost IMS-system with a pulsed nonradioactive electron source and a resolving power of 90.

Development of the Long Pulse Negative Ion Source for ITER

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hemsworth, R.S.; Svensson, L.; Esch, H.P.L. de

2005-04-06

A model of the ion source designed for the neutral beam injectors of the International Thermonuclear Experimental Reactor (ITER), the KAMABOKO III ion source, is being tested on the MANTIS test stand at the DRFC Cadarache in collaboration with JAERI, Japan, who designed and supplied the ion source. The ion source is attached to a 3 grid 30 keV accelerator (also supplied by JAERI) and the accelerated negative ion current is determined from the energy deposited on a calorimeter located 1.6 m from the source.During experiments on MANTIS three adverse effects of long pulse operation were found: The negative ionmore » current to the calorimeter is {approx_equal}50% of that obtained from short pulse operation Increasing the plasma grid (PG) temperature results in {<=}40% enhancement in negative ion yield, substantially below that reported for short pulse operation, {>=}100%. The caesium 'consumption' is up to 1500 times that expected.Results presented here indicate that each of these is, at least partially, explained by thermal effects. Additionally presented are the results of a detailed characterisation of the source, which enable the most efficient mode of operation to be identified.« less

Electrical shielding box measurement of the negative hydrogen beam from Penning ion gauge ion source.

PubMed

Wang, T; Yang, Z; Dong, P; long, J D; He, X Z; Wang, X; Zhang, K Z; Zhang, L W

2012-06-01

The cold-cathode Penning ion gauge (PIG) type ion source has been used for generation of negative hydrogen (H(-)) ions as the internal ion source of a compact cyclotron. A novel method called electrical shielding box dc beam measurement is described in this paper, and the beam intensity was measured under dc extraction inside an electrical shielding box. The results of the trajectory simulation and dc H(-) beam extraction measurement were presented. The effect of gas flow rate, magnetic field strength, arc current, and extraction voltage were also discussed. In conclusion, the dc H(-) beam current of about 4 mA from the PIG ion source with the puller voltage of 40 kV and arc current of 1.31 A was extrapolated from the measurement at low extraction dc voltages.

Overview of ion source characterization diagnostics in INTF

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bandyopadhyay, M., E-mail: mainak@iter-india.org; Sudhir, Dass; Bhuyan, M.

2016-02-15

INdian Test Facility (INTF) is envisaged to characterize ITER diagnostic neutral beam system and to establish the functionality of its eight inductively coupled RF plasma driver based negative hydrogen ion source and its beamline components. The beam quality mainly depends on the ion source performance and therefore, its diagnostics plays an important role for its safe and optimized operation. A number of diagnostics are planned in INTF to characterize the ion source performance. Negative ions and its cesium contents in the source will be monitored by optical emission spectroscopy (OES) and cavity ring down spectroscopy. Plasma near the extraction regionmore » will be studied using standard electrostatic probes. The beam divergence and negative ion stripping losses are planned to be measured using Doppler shift spectroscopy. During initial phase of ion beam characterization, carbon fiber composite based infrared imaging diagnostics will be used. Safe operation of the beam will be ensured by using standard thermocouples and electrical voltage-current measurement sensors. A novel concept, based on plasma density dependent plasma impedance measurement using RF electrical impedance matching parameters to characterize the RF driver plasma, will be tested in INTF and will be validated with OES data. The paper will discuss about the overview of the complete INTF diagnostics including its present status of procurement, experimentation, interface with mechanical systems in INTF, and integration with INTF data acquisition and control systems.« less

ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques

DOE Office of Scientific and Technical Information (OSTI.GOV)

Purandare, Yashodhan, E-mail: Y.Purandare@shu.ac.uk; Ehiasarian, Arutiun; Hovsepian, Papken

Zirconium nitride (ZrN) coatings were deposited on 1 μm finish high speed steel and 316L stainless steel test coupons. Cathodic Arc (CA) and High Power Impulse Magnetron Sputtering (HIPIMS) + Unbalanced Magnetron Sputtering (UBM) techniques were utilized to deposit coatings. CA plasmas are known to be rich in metal and gas ions of the depositing species as well as macroparticles (droplets) emitted from the arc sports. Combining HIPIMS technique with UBM in the same deposition process facilitated increased ion bombardment on the depositing species during coating growth maintaining high deposition rate. Prior to coating deposition, substrates were pretreated with Zr{sup +}more » rich plasma, for both arc deposited and HIPIMS deposited coatings, which led to a very high scratch adhesion value (L{sub C2}) of 100 N. Characterization results revealed the overall thickness of the coatings in the range of 2.5 μm with hardness in the range of 30–40 GPa depending on the deposition technique. Cross-sectional transmission electron microscopy and tribological experiments such as dry sliding wear tests and corrosion studies have been utilized to study the effects of ion bombardment on the structure and properties of these coatings. In all the cases, HIPIMS assisted UBM deposited coating fared equal or better than the arc deposited coatings, the reasons being discussed in this paper. Thus H+U coatings provide a good alternative to arc deposited where smooth, dense coatings are required and macrodroplets cannot be tolerated.« less

Combined corona discharge and UV photoionization source for ion mobility spectrometry.

PubMed

Bahrami, Hamed; Tabrizchi, Mahmoud

2012-08-15

An ion mobility spectrometer is described which is equipped with two non-radioactive ion sources, namely an atmospheric pressure photoionization and a corona discharge ionization source. The two sources cannot only run individually but are additionally capable of operating simultaneously. For photoionization, a UV lamp was mounted parallel to the axis of the ion mobility cell. The corona discharge electrode was mounted perpendicular to the UV radiation. The total ion current from the photoionization source was verified as a function of lamp current, sample flow rate, and drift field. Simultaneous operation of the two ionization sources was investigated by recording ion mobility spectra of selected samples. The design allows one to observe peaks from either the corona discharge or photoionization individually or simultaneously. This makes it possible to accurately compare peaks in the ion mobility spectra from each individual source. Finally, the instrument's capability for discriminating two peaks appearing in approximately identical drift times using each individual ionization source is demonstrated. Copyright © 2012 Elsevier B.V. All rights reserved.

Industrial ion source technology. [for ion beam etching, surface texturing, and deposition

NASA Technical Reports Server (NTRS)

Kaufman, H. R.

1977-01-01

Plasma probe surveys were conducted in a 30-cm source to verify that the uniformity in the ion beam is the result of a corresponding uniformity in the discharge-chamber plasma. A 15 cm permanent magnet multipole ion source was designed, fabricated, and demonstrated. Procedures were investigated for texturing a variety of seed and surface materials for controlling secondary electron emission, increasing electron absorption of light, and improved attachment of biological tissue for medical implants using argon and tetrafluoromethane as the working gases. The cross section for argon-argon elastic collisions in the ion-beam energy range was calculated from interaction potentials and permits calculation of beam interaction effects that can determine system pumping requirements. The data also indicate that different optimizations of ion-beam machines will be advantageous for long and short runs, with 1 mA-hr/cm being the rough dividing line for run length. The capacity to simultaneously optimize components in an ion-beam machine for a single application, a capacity that is not evident in competitive approaches such as diode sputtering is emphasized.

Kinetic energy offsets for multicharged ions from an electron beam ion source.

PubMed

Kulkarni, D D; Ahl, C D; Shore, A M; Miller, A J; Harriss, J E; Sosolik, C E; Marler, J P

2017-08-01

Using a retarding field analyzer, we have measured offsets between the nominal and measured kinetic energy of multicharged ions extracted from an electron beam ion source (EBIS). By varying source parameters, a shift in ion kinetic energy was attributed to the trapping potential produced by the space charge of the electron beam within the EBIS. The space charge of the electron beam depends on its charge density, which in turn depends on the amount of negative charge (electron beam current) and its velocity (electron beam energy). The electron beam current and electron beam energy were both varied to obtain electron beams of varying space charge and these were related to the observed kinetic energy offsets for Ar 4+ and Ar 8+ ion beams. Knowledge of these offsets is important for studies that seek to utilize slow, i.e., low kinetic energy, multicharged ions to exploit their high potential energies for processes such as surface modification. In addition, we show that these offsets can be utilized to estimate the effective radius of the electron beam inside the trap.

Intense beam production of highly charged heavy ions by the superconducting electron cyclotron resonance ion source SECRAL.

PubMed

Zhao, H W; Sun, L T; Zhang, X Z; Guo, X H; Cao, Y; Lu, W; Zhang, Z M; Yuan, P; Song, M T; Zhao, H Y; Jin, T; Shang, Y; Zhan, W L; Wei, B W; Xie, D Z

2008-02-01

There has been increasing demand to provide higher beam intensity and high enough beam energy for heavy ion accelerator and some other applications, which has driven electron cyclotron resonance (ECR) ion source to produce higher charge state ions with higher beam intensity. One of development trends for highly charged ECR ion source is to build new generation ECR sources by utilization of superconducting magnet technology. SECRAL (superconducting ECR ion source with advanced design in Lanzhou) was successfully built to produce intense beams of highly charged ion for Heavy Ion Research Facility in Lanzhou (HIRFL). The ion source has been optimized to be operated at 28 GHz for its maximum performance. The superconducting magnet confinement configuration of the ion source consists of three axial solenoid coils and six sextupole coils with a cold iron structure as field booster and clamping. An innovative design of SECRAL is that the three axial solenoid coils are located inside of the sextupole bore in order to reduce the interaction forces between the sextupole coils and the solenoid coils. For 28 GHz operation, the magnet assembly can produce peak mirror fields on axis of 3.6 T at injection, 2.2 T at extraction, and a radial sextupole field of 2.0 T at plasma chamber wall. During the commissioning phase at 18 GHz with a stainless steel chamber, tests with various gases and some metals have been conducted with microwave power less than 3.5 kW by two 18 GHz rf generators. It demonstrates the performance is very promising. Some record ion beam intensities have been produced, for instance, 810 e microA of O(7+), 505 e microA of Xe(20+), 306 e microA of Xe(27+), and so on. The effect of the magnetic field configuration on the ion source performance has been studied experimentally. SECRAL has been put into operation to provide highly charged ion beams for HIRFL facility since May 2007.

Intense highly charged ion beam production and operation with a superconducting electron cyclotron resonance ion source

NASA Astrophysics Data System (ADS)

Zhao, H. W.; Sun, L. T.; Guo, J. W.; Lu, W.; Xie, D. Z.; Hitz, D.; Zhang, X. Z.; Yang, Y.

2017-09-01

The superconducting electron cyclotron resonance ion source with advanced design in Lanzhou (SECRAL) is a superconducting-magnet-based electron cyclotron resonance ion source (ECRIS) for the production of intense highly charged heavy ion beams. It is one of the best performing ECRISs worldwide and the first superconducting ECRIS built with an innovative magnet to generate a high strength minimum-B field for operation with heating microwaves up to 24-28 GHz. Since its commissioning in 2005, SECRAL has so far produced a good number of continuous wave intensity records of highly charged ion beams, in which recently the beam intensities of 40Ar+ and 129Xe26+ have, for the first time, exceeded 1 emA produced by an ion source. Routine operations commenced in 2007 with the Heavy Ion accelerator Research Facility in Lanzhou (HIRFL), China. Up to June 2017, SECRAL has been providing more than 28,000 hours of highly charged heavy ion beams to the accelerator demonstrating its great capability and reliability. The great achievement of SECRAL is accumulation of numerous technical advancements, such as an innovative magnetic system and an efficient double-frequency (24 +18 GHz ) heating with improved plasma stability. This article reviews the development of SECRAL and production of intense highly charged ion beams by SECRAL focusing on its unique magnet design, source commissioning, performance studies and enhancements, beam quality and long-term operation. SECRAL development and its performance studies representatively reflect the achievements and status of the present ECR ion source, as well as the ECRIS impacts on HIRFL.

A W-band sixth-harmonic magnetron-type slotted peniotron

NASA Astrophysics Data System (ADS)

Hu, Biao; Li, Jiayin; Wu, Xinhui; Li, Tianming; Li, Hao; Wang, Haiyang; Zhao, Xiaoyun

2013-04-01

This paper has numerically investigated operating characteristics of a w-band six-harmonic magnetron-type slotted peniotron with 7 vanes. With the new structure design, a high efficiency of 40% w-band 30 kW medium power microwave source has been achieved and the mode competition can be somewhat suppressed. The main advantage of such a peniotron, based on a permanent magnet, is that it can have much more compact size and lower cost, and its operation gap can be greatly reduced.

Sputter deposition of MgxAlyOz thin films in a dual-magnetron device: a multi-species Monte Carlo model

NASA Astrophysics Data System (ADS)

Yusupov, M.; Saraiva, M.; Depla, D.; Bogaerts, A.

2012-07-01

A multi-species Monte Carlo (MC) model, combined with an analytical surface model, has been developed in order to investigate the general plasma processes occurring during the sputter deposition of complex oxide films in a dual-magnetron sputter deposition system. The important plasma species, such as electrons, Ar+ ions, fast Ar atoms and sputtered metal atoms (i.e. Mg and Al atoms) are described with the so-called multi-species MC model, whereas the deposition of MgxAlyOz films is treated by an analytical surface model. Target-substrate distances for both magnetrons in the dual-magnetron setup are varied for the purpose of growing stoichiometric complex oxide thin films. The metal atoms are sputtered from pure metallic targets, whereas the oxygen flux is only directed toward the substrate and is high enough to obtain fully oxidized thin films but low enough to avoid target poisoning. The calculations correspond to typical experimental conditions applied to grow these complex oxide films. In this paper, some calculation results are shown, such as the densities of various plasma species, their fluxes toward the targets and substrate, the deposition rates, as well as the film stoichiometry. Moreover, some results of the combined model are compared with experimental observations. Note that this is the first complete model, which can be applied for large and complicated magnetron reactor geometries, such as dual-magnetron configurations. With this model, we are able to describe all important plasma species as well as the deposition process. It can also be used to predict film stoichiometries of complex oxide films on the substrate.

Modeling of negative ion transport in a plasma source

NASA Astrophysics Data System (ADS)

Riz, David; Paméla, Jérôme

1998-08-01

A code called NIETZSCHE has been developed to simulate the negative ion transport in a plasma source, from their birth place to the extraction holes. The ion trajectory is calculated by numerically solving the 3-D motion equation, while the atomic processes of destruction, of elastic collision H-/H+ and of charge exchange H-/H0 are handled at each time step by a Monte-Carlo procedure. This code can be used to calculate the extraction probability of a negative ion produced at any location inside the source. Calculations performed with NIETZSCHE have allowed to explain, either quantitatively or qualitatively, several phenomena observed in negative ion sources, such as the isotopic H-/D- effect, and the influence of the plasma grid bias or of the magnetic filter on the negative ion extraction. The code has also shown that in the type of sources contemplated for ITER, which operate at large arc power densities (>1 W cm-3), negative ions can reach the extraction region provided if they are produced at a distance lower than 2 cm from the plasma grid in the case of «volume production» (dissociative attachment processes), or if they are produced at the plasma grid surface, in the vicinity of the extraction holes.

Thermal-electric numerical simulation of a surface ion source for the production of radioactive ion beams

NASA Astrophysics Data System (ADS)

Manzolaro, Mattia; Meneghetti, Giovanni; Andrighetto, Alberto

2010-11-01

In a facility for the production of radioactive ion beams (RIBs), the target system and the ion source are the most critical objects. In the context of the Selective Production of Exotic Species (SPES) project, a proton beam directly impinges a Uranium Carbide production target, generating approximately 10 13 fissions per second. The radioactive isotopes produced by the 238U fissions are then directed to the ion source to acquire a charge state. After that, the radioactive ions obtained are transported electrostatically to the subsequent areas of the facility. In this work the surface ion source at present adopted for the SPES project is studied by means of both analytical and numerical thermal-electric models. The theoretical results are compared with temperature and electric potential difference measurements.

Operation and development status of the J-PARC ion source

NASA Astrophysics Data System (ADS)

Yamazaki, S.; Ikegami, K.; Ohkoshi, K.; Ueno, A.; Koizumi, I.; Takagi, A.; Oguri, H.

2014-02-01

A cesium-free H- ion source driven with a LaB6 filament is being operated at the Japan Proton Accelerator Research Complex (J-PARC) without any serious trouble since the restoration from the March 2011 earthquake. The H- ion current from the ion source is routinely restricted approximately 19 mA for the lifetime of the filament. In order to increase the beam power at the linac beam operation (January to February 2013), the beam current from the ion source was increased to 22 mA. At this operation, the lifetime of the filament was estimated by the reduction in the filament current. According to the steep reduction in the filament current, the break of the filament was predicted. Although the filament has broken after approximately 10 h from the steep current reduction, the beam operation was restarted approximately 8 h later by the preparation for the exchange of new filament. At the study time for the 3 GeV rapid cycling synchrotron (April 2013), the ion source was operated at approximately 30 mA for 8 days. As a part of the beam current upgrade plan for the J-PARC, the front end test stand consisting of the ion source and the radio frequency quadrupole is under preparation. The RF-driven H- ion source developed for the J-PARC 2nd stage requirements will be tested at this test stand.

Simulation of cesium injection and distribution in rf-driven ion sources for negative hydrogen ion generation.

PubMed

Gutser, R; Fantz, U; Wünderlich, D

2010-02-01

Cesium seeded sources for surface generated negative hydrogen ions are major components of neutral beam injection systems in future large-scale fusion experiments such as ITER. Stability and delivered current density depend highly on the cesium conditions during plasma-on and plasma-off phases of the ion source. The Monte Carlo code CSFLOW3D was used to study the transport of neutral and ionic cesium in both phases. Homogeneous and intense flows were obtained from two cesium sources in the expansion region of the ion source and from a dispenser array, which is located 10 cm in front of the converter surface.

Relating to monitoring ion sources

DOEpatents

Orr, Christopher Henry; Luff, Craig Janson; Dockray, Thomas; Macarthur, Duncan Whittemore; Bounds, John Alan

2002-01-01

The apparatus and method provide techniques for monitoring the position on alpha contamination in or on items or locations. The technique is particularly applicable to pipes, conduits and other locations to which access is difficult. The technique uses indirect monitoring of alpha emissions by detecting ions generated by the alpha emissions. The medium containing the ions is moved in a controlled manner frog in proximity with the item or location to the detecting unit and the signals achieved over time are used to generate alpha source position information.

Very Large Area/Volume Microwave ECR Plasma and Ion Source

NASA Technical Reports Server (NTRS)

Foster, John E. (Inventor); Patterson, Michael J. (Inventor)

2009-01-01

The present invention is an apparatus and method for producing very large area and large volume plasmas. The invention utilizes electron cyclotron resonances in conjunction with permanent magnets to produce dense, uniform plasmas for long life ion thruster applications or for plasma processing applications such as etching, deposition, ion milling and ion implantation. The large area source is at least five times larger than the 12-inch wafers being processed to date. Its rectangular shape makes it easier to accommodate to materials processing than sources that are circular in shape. The source itself represents the largest ECR ion source built to date. It is electrodeless and does not utilize electromagnets to generate the ECR magnetic circuit, nor does it make use of windows.

Numerical simulation of ion charge breeding in electron beam ion source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhao, L., E-mail: zhao@far-tech.com; Kim, Jin-Soo

2014-02-15

The Electron Beam Ion Source particle-in-cell code (EBIS-PIC) tracks ions in an EBIS electron beam while updating electric potential self-consistently and atomic processes by the Monte Carlo method. Recent improvements to the code are reported in this paper. The ionization module has been improved by using experimental ionization energies and shell effects. The acceptance of injected ions and the emittance of extracted ion beam are calculated by extending EBIS-PIC to the beam line transport region. An EBIS-PIC simulation is performed for a Cs charge-breeding experiment at BNL. The charge state distribution agrees well with experiments, and additional simulation results ofmore » radial profiles and velocity space distributions of the trapped ions are presented.« less

Development of a helicon ion source: Simulations and preliminary experiments.

PubMed

Afsharmanesh, M; Habibi, M

2018-03-01

In the present context, the extraction system of a helicon ion source has been simulated and constructed. Results of the ion source commissioning at up to 20 kV are presented as well as simulations of an ion beam extraction system. Argon current of more than 200 μA at up to 20 kV is extracted and is characterized with a Faraday cup and beam profile monitoring grid. By changing different ion source parameters such as RF power, extraction voltage, and working pressure, an ion beam with current distribution exhibiting a central core has been detected. Jump transition of ion beam current emerges at the RF power near to 700 W, which reveals that the helicon mode excitation has reached this power. Furthermore, measuring the emission line intensity of Ar ii at 434.8 nm is the other way we have used for demonstrating the mode transition from inductively coupled plasma to helicon. Due to asymmetrical longitudinal power absorption of a half-helix helicon antenna, it is used for the ion source development. The modeling of the plasma part of the ion source has been carried out using a code, HELIC. Simulations are carried out by taking into account a Gaussian radial plasma density profile and for plasma densities in range of 10 18 -10 19 m -3 . Power absorption spectrum and the excited helicon mode number are obtained. Longitudinal RF power absorption for two different antenna positions is compared. Our results indicate that positioning the antenna near to the plasma electrode is desirable for the ion beam extraction. The simulation of the extraction system was performed with the ion optical code IBSimu, making it the first helicon ion source extraction designed with the code. Ion beam emittance and Twiss parameters of the ellipse emittance are calculated at different iterations and mesh sizes, and the best values of the mesh size and iteration number have been obtained for the calculations. The simulated ion beam extraction system has been evaluated using optimized parameters

Development of a helicon ion source: Simulations and preliminary experiments

NASA Astrophysics Data System (ADS)

Afsharmanesh, M.; Habibi, M.

2018-03-01

In the present context, the extraction system of a helicon ion source has been simulated and constructed. Results of the ion source commissioning at up to 20 kV are presented as well as simulations of an ion beam extraction system. Argon current of more than 200 μA at up to 20 kV is extracted and is characterized with a Faraday cup and beam profile monitoring grid. By changing different ion source parameters such as RF power, extraction voltage, and working pressure, an ion beam with current distribution exhibiting a central core has been detected. Jump transition of ion beam current emerges at the RF power near to 700 W, which reveals that the helicon mode excitation has reached this power. Furthermore, measuring the emission line intensity of Ar ii at 434.8 nm is the other way we have used for demonstrating the mode transition from inductively coupled plasma to helicon. Due to asymmetrical longitudinal power absorption of a half-helix helicon antenna, it is used for the ion source development. The modeling of the plasma part of the ion source has been carried out using a code, HELIC. Simulations are carried out by taking into account a Gaussian radial plasma density profile and for plasma densities in range of 1018-1019 m-3. Power absorption spectrum and the excited helicon mode number are obtained. Longitudinal RF power absorption for two different antenna positions is compared. Our results indicate that positioning the antenna near to the plasma electrode is desirable for the ion beam extraction. The simulation of the extraction system was performed with the ion optical code IBSimu, making it the first helicon ion source extraction designed with the code. Ion beam emittance and Twiss parameters of the ellipse emittance are calculated at different iterations and mesh sizes, and the best values of the mesh size and iteration number have been obtained for the calculations. The simulated ion beam extraction system has been evaluated using optimized parameters such

Large area multiarc ion beam source {open_quote}MAIS{close_quote}

DOE Office of Scientific and Technical Information (OSTI.GOV)

Engelko, V.; Giese, H.; Schalk, S.

1996-12-31

A pulsed large area intense ion beam source is described, in which the ion emitting plasma is built up by an array of individual discharge units, homogeneously distributed over the surface of a common discharge electrode. A particularly advantageous feature of the source is that for plasma generation and subsequent acceleration of the ions only one common energy supply is necessary. This allows to simplify the source design and provides inherent synchronization of plasma production and ion extraction. The homogeneity of the plasma density was found to be superior to plasma sources using plasma expanders. Originally conceived for the productionmore » of proton beams, the source can easily be modified for the production of beams composed of carbon and metal ions or mixed ion species. Results of investigations of the source performance for the production of a proton beam are presented. The maximum beam current achieved to date is of the order of 100 A, with a particle kinetic energy of 15 - 30 keV and a pulse length in the range of 10 {mu}s.« less

Singularity and Bohm criterion in hot positive ion species in the electronegative ion sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Aslaninejad, Morteza; Yasserian, Kiomars

2016-05-15

The structure of the discharge for a magnetized electronegative ion source with two species of positive ions is investigated. The thermal motion of hot positive ions and the singularities involved with it are taken into account. By analytical solution of the neutral region, the location of the singular point and also the values of the plasma parameter such as electric potential and ion density at the singular point are obtained. A generalized Bohm criterion is recovered and discussed. In addition, for the non-neutral solution, the numerical method is used. In contrast with cold ion plasma, qualitative changes are observed. Themore » parameter space region within which oscillations in the density and potential can be observed has been scanned and discussed. The space charge behavior in the vicinity of edge of the ion sources has also been discussed in detail.« less

Status of ion sources at National Institute of Radiological Sciences.

PubMed

Kitagawa, A; Fujita, T; Goto, A; Hattori, T; Hamano, T; Hojo, S; Honma, T; Imaseki, H; Katagiri, K; Muramatsu, M; Sakamoto, Y; Sekiguchi, M; Suda, M; Sugiura, A; Suya, N

2012-02-01

The National Institute of Radiological Sciences (NIRS) maintains various ion accelerators in order to study the effects of radiation of the human body and medical uses of radiation. Two electrostatic tandem accelerators and three cyclotrons delivered by commercial companies have offered various life science tools; these include proton-induced x-ray emission analysis (PIXE), micro beam irradiation, neutron exposure, and radioisotope tracers and probes. A duoplasmatron, a multicusp ion source, a penning ion source (PIG), and an electron cyclotron resonance ion source (ECRIS) are in operation for these purposes. The Heavy-Ion Medical Accelerator in Chiba (HIMAC) is an accelerator complex for heavy-ion radiotherapy, fully developed by NIRS. HIMAC is utilized not only for daily treatment with the carbon beam but also for fundamental experiments. Several ECRISs and a PIG at HIMAC satisfy various research and clinical requirements.

Status of ion sources at National Institute of Radiological Sciencesa)

NASA Astrophysics Data System (ADS)

Kitagawa, A.; Fujita, T.; Goto, A.; Hattori, T.; Hamano, T.; Hojo, S.; Honma, T.; Imaseki, H.; Katagiri, K.; Muramatsu, M.; Sakamoto, Y.; Sekiguchi, M.; Suda, M.; Sugiura, A.; Suya, N.

2012-02-01

The National Institute of Radiological Sciences (NIRS) maintains various ion accelerators in order to study the effects of radiation of the human body and medical uses of radiation. Two electrostatic tandem accelerators and three cyclotrons delivered by commercial companies have offered various life science tools; these include proton-induced x-ray emission analysis (PIXE), micro beam irradiation, neutron exposure, and radioisotope tracers and probes. A duoplasmatron, a multicusp ion source, a penning ion source (PIG), and an electron cyclotron resonance ion source (ECRIS) are in operation for these purposes. The Heavy-Ion Medical Accelerator in Chiba (HIMAC) is an accelerator complex for heavy-ion radiotherapy, fully developed by NIRS. HIMAC is utilized not only for daily treatment with the carbon beam but also for fundamental experiments. Several ECRISs and a PIG at HIMAC satisfy various research and clinical requirements.

Ion source issues for the DAEδALUS neutrino experiment

DOE Office of Scientific and Technical Information (OSTI.GOV)

Alonso, Jose R., E-mail: JRAlonso@LBL.gov; Barletta, William A.; Toups, Matthew H.

2014-02-15

The DAEδALUS experiment calls for 10 mA of protons at 800 MeV on a neutrino-producing target. To achieve this record-setting current from a cyclotron system, H{sub 2}{sup +} ions will be accelerated. Loosely bound vibrationally excited H{sub 2}{sup +} ions inevitably produced in conventional ion sources will be Lorentz stripped at the highest energies. Presence of these states was confirmed at the Oak Ridge National Laboratory and strategies were investigated to quench them, leading to a proposed R and D effort towards a suitable ion source for these high-power cyclotrons.

Miniature cyclotron resonance ion source using small permanent magnet

NASA Technical Reports Server (NTRS)

Anicich, V. G.; Huntress, W. T., Jr. (Inventor)

1980-01-01

An ion source using the cyclotron resonance principle is described. A miniaturized ion source device is used in an air gap of a small permanent magnet with a substantially uniform field in the air gap of about 0.5 inch. The device and permanent magnet are placed in an enclosure which is maintained at a high vacuum (typically 10 to the minus 7th power) into which a sample gas can be introduced. The ion beam end of the device is placed very close to an aperture through which an ion beam can exit into the apparatus for an experiment.

Ion beam production and study of radioactive isotopes with the laser ion source at ISOLDE

NASA Astrophysics Data System (ADS)

Fedosseev, Valentin; Chrysalidis, Katerina; Day Goodacre, Thomas; Marsh, Bruce; Rothe, Sebastian; Seiffert, Christoph; Wendt, Klaus

2017-08-01

At ISOLDE the majority of radioactive ion beams are produced using the resonance ionization laser ion source (RILIS). This ion source is based on resonant excitation of atomic transitions by wavelength tunable laser radiation. Since its installation at the ISOLDE facility in 1994, the RILIS laser setup has been developed into a versatile remotely operated laser system comprising state-of-the-art solid state and dye lasers capable of generating multiple high quality laser beams at any wavelength in the range of 210-950 nm. A continuous programme of atomic ionization scheme development at CERN and at other laboratories has gradually increased the number of RILIS-ionized elements. At present, isotopes of 40 different elements have been selectively laser-ionized by the ISOLDE RILIS. Studies related to the optimization of the laser-atom interaction environment have yielded new laser ion source types: the laser ion source and trap and the versatile arc discharge and laser ion source. Depending on the specific experimental requirements for beam purity or versatility to switch between different ionization mechanisms, these may offer a favourable alternative to the standard hot metal cavity configuration. In addition to its main purpose of ion beam production, the RILIS is used for laser spectroscopy of radioisotopes. In an ongoing experimental campaign the isotope shifts and hyperfine structure of long isotopic chains have been measured by the extremely sensitive in-source laser spectroscopy method. The studies performed in the lead region were focused on nuclear deformation and shape coexistence effects around the closed proton shell Z = 82. The paper describes the functional principles of the RILIS, the current status of the laser system and demonstrated capabilities for the production of different ion beams including the high-resolution studies of short-lived isotopes and other applications of RILIS lasers for ISOLDE experiments. This article belongs to the Focus on

Ion source design for industrial applications

NASA Technical Reports Server (NTRS)

Kaufman, H. R.; Robinson, R. S.

1981-01-01

The more frequently used design techniques for the components of broad-beam electron bombardment ion sources are discussed. The approach used emphasizes refractory metal cathodes and permanent-magnet multipole discharge chambers. Design procedures and sample calculations are given for the discharge chamber, ion optics, the cathodes, and the magnetic circuit. Hardware designs are included for the isolator, cathode supports, anode supports, pole-piece assembly, and ion-optics supports. A comparison is made between two-grid and three-grid optics. The designs presented are representative of current technology and are adaptable to a wide range of configurations.

Comment on "Effects of Magnetic Field Gradient on Ion Beam Current in Cylindrical Hall Ion Source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Raitses, Y.; Smirnov A.; Fisch, N.J.

It is argued that the key difference of the cylindrical Hall thruster (CHT) as compared to the end-Hall ion source cannot be exclusively attributed to the magnetic field topology [Tang et al. J. Appl. Phys., 102, 123305 (2007)]. With a similar mirror-type topology, the CHT configuration provides the electric field with nearly equipotential magnetic field surfaces and a better suppression of the electron cross-field transport, as compared to both the end-Hall ion source and the cylindrical Hall ion source of Tang et al.

Preliminary result of rapid solenoid for controlling heavy-ion beam parameters of laser ion source

DOE PAGES

Okamura, M.; Sekine, M.; Ikeda, S.; ...

2015-03-13

To realize a heavy ion inertial fusion driver, we have studied a possibility of laser ion source (LIS). A LIS can provide high current high brightness heavy ion beams, however it was difficult to manipulate the beam parameters. To overcome the issue, we employed a pulsed solenoid in the plasma drift section and investigated the effect of the solenoid field on singly charged iron beams. The rapid ramping magnetic field could enhance limited time slice of the current and simultaneously the beam emittance changed accordingly. This approach may also useful to realize an ion source for HIF power plant.

Comparison of reactant and analyte ions for ⁶³Nickel, corona discharge, and secondary electrospray ionization sources with ion mobility-mass spectrometry.

PubMed

Crawford, C L; Hill, H H

2013-03-30

(63)Nickel radioactive ionization ((63)Ni) is the most common and widely used ion source for ion mobility spectrometry (IMS). Regulatory, financial, and operational concerns with this source have promoted recent development of non-radioactive sources, such as corona discharge ionization (CD), for stand-alone IMS systems. However, there has been no comparison of the negative ion species produced by all three sources in the literature. This study compares the negative reactant and analyte ions produced by three sources on an ion mobility-mass spectrometer: conventional (63)Ni, CD, and secondary electrospray ionization (SESI). Results showed that (63)Ni and SESI produced the same reactant ion species while CD produced only the nitrate monomer and dimer ions. The analyte ions produced by each ion source were the same except for the CD source which produced a different ion species for the explosive RDX than either the (63)Ni or SESI source. Accurate and reproducible reduced mobility (K0) values, including several values reported here for the first time, were found for each explosive with each ion source. Overall, the SESI source most closely reproduced the reactant ion species and analyte ion species profiles for (63)Ni. This source may serve as a non-radioactive, robust, and flexible alternative for (63)Ni. Copyright © 2013 Elsevier B.V. All rights reserved.

Modeling of negative ion transport in a plasma source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Riz, David; Departement de Recherches sur la Fusion Controelee CE Cadarache, 13108 St Paul lez Durance; Pamela, Jerome

1998-08-20

A code called NIETZSCHE has been developed to simulate the negative ion transport in a plasma source, from their birth place to the extraction holes. The ion trajectory is calculated by numerically solving the 3-D motion equation, while the atomic processes of destruction, of elastic collision H{sup -}/H{sup +} and of charge exchange H{sup -}/H{sup 0} are handled at each time step by a Monte-Carlo procedure. This code can be used to calculate the extraction probability of a negative ion produced at any location inside the source. Calculations performed with NIETZSCHE have allowed to explain, either quantitatively or qualitatively, severalmore » phenomena observed in negative ion sources, such as the isotopic H{sup -}/D{sup -} effect, and the influence of the plasma grid bias or of the magnetic filter on the negative ion extraction. The code has also shown that in the type of sources contemplated for ITER, which operate at large arc power densities (>1 W cm{sup -3}), negative ions can reach the extraction region provided if they are produced at a distance lower than 2 cm from the plasma grid in the case of 'volume production' (dissociative attachment processes), or if they are produced at the plasma grid surface, in the vicinity of the extraction holes.« less

RF-driven ion source with a back-streaming electron dump

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kwan, Joe; Ji, Qing

A novel ion source is described having an improved lifetime. The ion source, in one embodiment, is a proton source, including an external RF antenna mounted to an RF window. To prevent backstreaming electrons formed in the beam column from striking the RF window, a back streaming electron dump is provided, which in one embodiment is formed of a cylindrical tube, open at one end to the ion source chamber and capped at its other end by a metal plug. The plug, maintained at the same electrical potential as the source, captures these backstreaming electrons, and thus prevents localized heatingmore » of the window, which due to said heating, might otherwise cause window damage.« less

An overview of negative hydrogen ion sources for accelerators

NASA Astrophysics Data System (ADS)

Faircloth, Dan; Lawrie, Scott

2018-02-01

An overview of high current (>1 mA) negative hydrogen ion (H-) sources that are currently used on particle accelerators. The current understanding of how H- ions are produced is summarised. Issues relating to caesium usage are explored. The different ways of expressing emittance and beam currents are clarified. Source technology naming conventions are defined and generalised descriptions of each source technology are provided. Examples of currently operating sources are outlined, with their current status and future outlook given. A comparative table is provided.

Improvements to the internal and external antenna H(-) ion sources at the Spallation Neutron Source.

PubMed

Welton, R F; Dudnikov, V G; Han, B X; Murray, S N; Pennisi, T R; Pillar, C; Santana, M; Stockli, M P; Turvey, M W

2014-02-01

The Spallation Neutron Source (SNS), a large scale neutron production facility, routinely operates with 30-40 mA peak current in the linac. Recent measurements have shown that our RF-driven internal antenna, Cs-enhanced, multi-cusp ion sources injects ∼55 mA of H(-) beam current (∼1 ms, 60 Hz) at 65-kV into a Radio Frequency Quadrupole (RFQ) accelerator through a closely coupled electrostatic Low-Energy Beam Transport system. Over the last several years a decrease in RFQ transmission and issues with internal antennas has stimulated source development at the SNS both for the internal and external antenna ion sources. This report discusses progress in improving internal antenna reliability, H(-) yield improvements which resulted from modifications to the outlet aperture assembly (applicable to both internal and external antenna sources) and studies made of the long standing problem of beam persistence with the external antenna source. The current status of the external antenna ion source will also be presented.

rf improvements for Spallation Neutron Source H- ion sourcea)

NASA Astrophysics Data System (ADS)

Kang, Y. W.; Fuja, R.; Goulding, R. H.; Hardek, T.; Lee, S.-W.; McCarthy, M. P.; Piller, M. C.; Shin, K.; Stockli, M. P.; Welton, R. F.

2010-02-01

The Spallation Neutron Source at Oak Ridge National Laboratory is ramping up the accelerated proton beam power to 1.4 MW and just reached 1 MW. The rf-driven multicusp ion source that originates from the Lawrence Berkeley National Laboratory has been delivering ˜38 mA H- beam in the linac at 60 Hz, 0.9 ms. To improve availability, a rf-driven external antenna multicusp ion source with a water-cooled ceramic aluminum nitride (AlN) plasma chamber is developed. Computer modeling and simulations have been made to analyze and optimize the rf performance of the new ion source. Operational statistics and test runs with up to 56 mA medium energy beam transport beam current identify the 2 MHz rf system as a limiting factor in the system availability and beam production. Plasma ignition system is under development by using a separate 13 MHz system. To improve the availability of the rf power system with easier maintenance, we tested a 70 kV isolation transformer for the 80 kW, 6% duty cycle 2 MHz amplifier to power the ion source from a grounded solid-state amplifier.

Nb3Sn superconducting magnets for electron cyclotron resonance ion sources.

PubMed

Ferracin, P; Caspi, S; Felice, H; Leitner, D; Lyneis, C M; Prestemon, S; Sabbi, G L; Todd, D S

2010-02-01

Electron cyclotron resonance (ECR) ion sources are an essential component of heavy-ion accelerators. Over the past few decades advances in magnet technology and an improved understanding of the ECR ion source plasma physics have led to remarkable performance improvements of ECR ion sources. Currently third generation high field superconducting ECR ion sources operating at frequencies around 28 GHz are the state of the art ion injectors and several devices are either under commissioning or under design around the world. At the same time, the demand for increased intensities of highly charged heavy ions continues to grow, which makes the development of even higher performance ECR ion sources a necessity. To extend ECR ion sources to frequencies well above 28 GHz, new magnet technology will be needed in order to operate at higher field and force levels. The superconducting magnet program at LBNL has been developing high field superconducting magnets for particle accelerators based on Nb(3)Sn superconducting technology for several years. At the moment, Nb(3)Sn is the only practical conductor capable of operating at the 15 T field level in the relevant configurations. Recent design studies have been focused on the possibility of using Nb(3)Sn in the next generation of ECR ion sources. In the past, LBNL has worked on the VENUS ECR, a 28 GHz source with solenoids and a sextupole made with NbTi operating at fields of 6-7 T. VENUS has now been operating since 2004. We present in this paper the design of a Nb(3)Sn ECR ion source optimized to operate at an rf frequency of 56 GHz with conductor peak fields of 13-15 T. Because of the brittleness and strain sensitivity of Nb(3)Sn, particular care is required in the design of the magnet support structure, which must be capable of providing support to the coils without overstressing the conductor. In this paper, we present the main features of the support structure, featuring an external aluminum shell pretensioned with water

Static time-of-flight secondary ion mass spectrometry analysis of microelectronics related substrates using a polyatomic ion source

NASA Astrophysics Data System (ADS)

Ravanel, X.; Trouiller, C.; Juhel, M.; Wyon, C.; Kwakman, L. F. Tz.; Léonard, D.

2008-12-01

Recent time-of-flight secondary ion mass spectrometry studies using primary ion cluster sources such as Au n+, SF 5+, Bi n+ or C 60+ have shown the great advantages in terms of secondary ion yield enhancement and ion formation efficiency of polyatomic ion sources as compared to monoatomic ion sources like the commonly used Ga +. In this work, the effective gains provided by such a source in the static ToF-SIMS analysis of microelectronics devices were investigated. Firstly, the influence of the number of atoms in the primary cluster ion on secondary ion formation was studied for physically adsorbed di-isononyl phthalate (DNP) (plasticizer) and perfluoropolyether (PFPE). A drastic increase in secondary ion formation efficiency and a much lower detection limit were observed when using a polyatomic primary ion. Moreover, the yield of the higher mass species was much enhanced indicating a lower degree of fragmentation that can be explained by the fact that the primary ion energy is spread out more widely, or that there is a lower energy per incoming ion. Secondly, the influence of the number of Bi atoms in the Bi n primary ion on the information depth was studied using reference thermally grown silicon oxide samples. The information depth provided by a Bi n cluster was shown to be lowered when the number of atoms in the aggregate was increased.

Electrohydrodynamically driven large-area liquid ion sources

DOEpatents

Pregenzer, Arian L.

1988-01-01

A large-area liquid ion source comprises means for generating, over a large area of the surface of a liquid, an electric field of a strength sufficient to induce emission of ions from a large area of said liquid. Large areas in this context are those distinct from emitting areas in unidimensional emitters.

A high brightness source for nano-probe secondary ion mass spectrometry

NASA Astrophysics Data System (ADS)

Smith, N. S.; Tesch, P. P.; Martin, N. P.; Kinion, D. E.

2008-12-01

The two most prevalent ion source technologies in the field of surface analysis and surface machining are the Duoplasmatron and the liquid metal ion source (LMIS). There have been many efforts in this area of research to develop an alternative source [ S.K. Guharay, J. Orloff, M. Wada, IEEE Trans. Plasma Sci. 33 (6) (2005) 1911; N.S. Smith, W.P. Skoczylas, S.M. Kellogg, D.E. Kinion, P.P. Tesch, O. Sutherland, A. Aanesland, R.W. Boswell, J. Vac. Sci. Technol. B 24 (6) (2006) 2902-2906] with the brightness of a LMIS and yet the ability to produce secondary ion yield enhancing species such as oxygen. However, to date a viable alternative has not been realized. The high brightness and small virtual source size of the LMIS are advantageous for forming high resolution probes but a significant disadvantage when beam currents in excess of 100 nA are required, due to the effects of spherical aberration from the optical column. At these higher currents a source with a high angular intensity is optimal and in fact the relatively moderate brightness of today's plasma ion sources prevail in this operating regime. Both the LMIS and Duoplasmatron suffer from a large axial energy spread resulting in further limitations when forming focused beams at the chromatic limit where the figure-of-merit is inversely proportional to the square of the energy spread. Also, both of these ion sources operate with a very limited range of ion species. This article reviews some of the latest developments and some future potential in this area of instrument development. Here we present an approach to source development that could lead to oxygen ion beam SIMS imaging with 10 nm resolution, using a 'broad area' RF gas phase ion source.

Phase Grouping of Larmor Electrons by a Synchronous Wave in Controlled Magnetrons

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kazakevich, G.; Johnson, R.; Lebedev, V.

A simplified analytical model based on the charge drift approximation has been developed. It considers the resonant interaction of the synchronous wave with the flow of Larmor electrons in a magnetron. The model predicts stable coherent generation of the tube above and below the threshold of self-excitation. This occurs if the magnetron is driven by a sufficient resonant injected signal (up to -10 dB). The model substantiates precise stability, high efficiency and low noise at the range of the magnetron power control over 10 dB by variation of the magnetron current. The model and the verifying experiments with 2.45 GHz,more » 1 kW magnetrons are discussed.« less

Method and apparatus for improved high power impulse magnetron sputtering

DOEpatents

Anders, Andre

2013-11-05

A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.

Xenon gas field ion source from a single-atom tip

NASA Astrophysics Data System (ADS)

Lai, Wei-Chiao; Lin, Chun-Yueh; Chang, Wei-Tse; Li, Po-Chang; Fu, Tsu-Yi; Chang, Chia-Seng; Tsong, T. T.; Hwang, Ing-Shouh

2017-06-01

Focused ion beam (FIB) systems have become powerful diagnostic and modification tools for nanoscience and nanotechnology. Gas field ion sources (GFISs) built from atomic-size emitters offer the highest brightness among all ion sources and thus can improve the spatial resolution of FIB systems. Here we show that the Ir/W(111) single-atom tip (SAT) can emit high-brightness Xe+ ion beams with a high current stability. The ion emission current versus extraction voltage was analyzed from 150 K up to 309 K. The optimal emitter temperature for maximum Xe+ ion emission was ˜150 K and the reduced brightness at the Xe gas pressure of 1 × 10-4 torr is two to three orders of magnitude higher than that of a Ga liquid metal ion source, and four to five orders of magnitude higher than that of a Xe inductively coupled plasma ion source. Most surprisingly, the SAT emitter remained stable even when operated at 309 K. Even though the ion current decreased with increasing temperature, the current at room temperature (RT) could still reach over 1 pA when the gas pressure was higher than 1 × 10-3 torr, indicating the feasibility of RT-Xe-GFIS for application to FIB systems. The operation temperature of Xe-SAT-GFIS is considerably higher than the cryogenic temperature required for the helium ion microscope (HIM), which offers great technical advantages because only simple or no cooling schemes can be adopted. Thus, Xe-GFIS-FIB would be easy to implement and may become a powerful tool for nanoscale milling and secondary ion mass spectroscopy.

A Collison nebulizer as an ion source for mass spectrometry analysis

NASA Astrophysics Data System (ADS)

Pervukhin, V. V.; Sheven', D. G.; Kolomiets, Yu. N.

2014-12-01

It is proposed to use a Collison nebulizer as a source of ionization for mass-spectrometry with ionization at atmospheric pressure. This source does not require an electric voltage, radioactive sources, heaters, or liquid pumps. It is shown that the number of ions produced by the Collison nebulizer is ten times greater than the quantity of ions produced by the 63Ni radioactive source and three to four times greater than the number of ions produced with sonic ionization devices.

Simulation and Experimental Studies of a 2.45GHz Magnetron Source for an SRF Cavity with Field Amplitude and Phase Controls

DOE Office of Scientific and Technical Information (OSTI.GOV)

Wang, Haipeng; Plawski, Tomasz E.; Rimmer, Robert A.

2016-06-01

Phase lock to an SRF cavity by using injection signal through output waveguide of a magnetron has been demonstrated [1, 3]. Amplitude control using magnetic field trimming and anode voltage modulation has been studied using MATLAB/Simulink simulations [2]. Based on these, we are planning to use an FPGA based digital LLRF system, which allows applying various types of control algorithms in order to achieve the required accelerating field stability. Since the 1497 MHz magnetron is still in the design stage, the proof of principle measurements of a commercial 2450 MHz magnetron are carried out to characterize the anode I-V curve,more » output power (the tube electronic efficiency), frequency dependence on the anode current (frequency pushing) and the Rieke diagram (frequency pulling by the reactive load). Based on early Simulink simulation, experimental data and extension of the Adler equation governing injection phase stability by Chen’s model, the specification of the new LLRF control chassis for both 2450 and 1497MHz systems are presented in this paper.« less

Laser ion source for multi-nucleon transfer reaction products

NASA Astrophysics Data System (ADS)

Hirayama, Y.; Watanabe, Y. X.; Imai, N.; Ishiyama, H.; Jeong, S. C.; Miyatake, H.; Oyaizu, M.; Kimura, S.; Mukai, M.; Kim, Y. H.; Sonoda, T.; Wada, M.; Huyse, M.; Kudryavtsev, Yu.; Van Duppen, P.

2015-06-01

We have developed a laser ion source for the target-like fragments (TLFs) produced in multi-nucleon transfer (MNT) reactions. The operation principle of the source is based on the in-gas laser ionization and spectroscopy (IGLIS) approach. In the source TLFs are thermalized and neutralized in high pressure and high purity argon gas, and are extracted after being selectively re-ionized in a multi-step laser resonance ionization process. The laser ion source has been implemented at the KEK Isotope Separation System (KISS) for β-decay spectroscopy of neutron-rich isotopes with N = 126 of nuclear astrophysical interest. The simulations of gas flow and ion-beam optics have been performed to optimize the gas cell for efficient thermalization and fast transporting the TLFs, and the mass-separator for efficient transport with high mass-resolving power, respectively. To confirm the performances expected at the design stage, off-line experiments have been performed by using 56Fe atoms evaporated from a filament in the gas cell. The gas-transport time of 230 ms in the argon cell and the measured KISS mass-resolving power of 900 are consistent with the designed values. The high purity of the gas-cell system, which is extremely important for efficient and highly-selective production of laser ions, was achieved and confirmed from the mass distribution of the extracted ions. After the off-line tests, on-line experiments were conducted by directly injecting energetic 56Fe beam into the gas cell. After thermalization of the injected 56Fe beam, laser-produced singly-charged 56Fe+ ions were extracted. The extraction efficiency and selectivity of the gas cell in the presence of plasma induced by 56Fe beam injection as well as the time profile of the extracted ions were investigated; extraction efficiency of 0.25%, a beam purity of >99% and an extraction time of 270 ms. It has been confirmed that the performance of the KISS laser ion source is satisfactory to start the measurements of

Emittance studies of the 2.45 GHz permanent magnet ECR ion source

NASA Astrophysics Data System (ADS)

Zelenak, A.; Bogomolov, S. L.; Yazvitsky, N. Yu.

2004-05-01

During the past several years different types of permanent magnet 2.45 GHz (electron cyclotron resonance) ion sources were developed for production of singly charged ions. Ion sources of this type are used in the first stage of DRIBs project, and are planned to be used in the MASHA mass separator. The emittance of the beam provided by the source is one of the important parameters for these applications. An emittance scanner composed from a set of parallel slits and rotary wire beam profile monitor was used for the studying of the beam emittance characteristics. The emittance of helium and argon ion beams was measured with different shapes of the plasma electrode for several ion source parameters: microwave power, source potential, plasma aperture-puller aperture gap distance, gas pressure. The results of measurements are compared with previous simulations of ion optics.

Electron cyclotron resonance ion source experience at the Heidelberg Ion Beam Therapy Centera)

NASA Astrophysics Data System (ADS)

Winkelmann, T.; Cee, R.; Haberer, T.; Naas, B.; Peters, A.; Scheloske, S.; Spädtke, P.; Tinschert, K.

2008-02-01

Radiotherapy with heavy ions is an upcoming cancer treatment method with to date unparalleled precision. It associates higher control rates particularly for radiation resistant tumor species with reduced adverse effects compared to conventional photon therapy. The accelerator beam lines and structures of the Heidelberg Ion Beam Therapy Center (HIT) have been designed under the leadership of GSI, Darmstadt with contributions of the IAP Frankfurt. Currently, the accelerator is under commissioning, while the injector linac has been completed. When the patient treatment begins in 2008, HIT will be the first medical heavy ion accelerator in Europe. This presentation will provide an overview about the project, with special attention given to the 14.5GHz electron cyclotron resonance (ECR) ion sources in operation with carbon, hydrogen, helium, and oxygen, and the experience of one year of continuous operation. It also displays examples for beam emittances, measured in the low energy beam transport. In addition to the outlook of further developments at the ECR ion sources for a continuously stable operation, this paper focuses on some of the technical processings of the past year.

Characterization of the ITER model negative ion source during long pulse operation

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hemsworth, R.S.; Boilson, D.; Crowley, B.

2006-03-15

It is foreseen to operate the neutral beam system of the International Thermonuclear Experimental Reactor (ITER) for pulse lengths extending up to 1 h. The performance of the KAMABOKO III negative ion source, which is a model of the source designed for ITER, is being studied on the MANTIS test bed at Cadarache. This article reports the latest results from the characterization of the ion source, in particular electron energy distribution measurements and the comparison between positive ion and negative ion extraction from the source.

The target material influence on the current pulse during high power pulsed magnetron sputtering

NASA Astrophysics Data System (ADS)

Moens, Filip; Konstantinidis, Stéphanos; Depla, Diederik

2017-10-01

The current-time characteristic during high power pulsed magnetron sputtering is measured under identical conditions for seventeen different target materials. Based on physical processes such as gas rarefaction, ion-induced electron emission, and electron impact ionization, two test parameters were derived that significantly correlate with specific features of the current-time characteristic: i) the peak current is correlated to the momentum transfer between the sputtered material and the argon gas, ii) while the observed current plateau after the peak is connected to the metal ionization rate.

Development of a compact electron-cyclotron-resonance ion source for high-energy carbon-ion therapy

NASA Astrophysics Data System (ADS)

Muramatsu, M.; Kitagawa, A.; Sakamoto, Y.; Sato, S.; Sato, Y.; Ogawa, Hirotsugu; Yamada, S.; Ogawa, Hiroyuki; Yoshida, Y.; Drentje, A. G.

2005-11-01

Ion sources for medical facilities should have characteristics of easy maintenance, low electric power consumption, good stability, and long operation time without problems (one year or longer). For this, a 10GHz compact electron-cyclotron-resonance ion source with all-permanent magnets (Kei2 source) was developed. The maximum mirror magnetic fields on the beam axis are 0.59T at the extraction side and 0.87T at the gas-injection side, while the minimum B strength is 0.25T. These parameters have been optimized for the production of C4+ based on the experience at the 10GHz NIRS-ECR ion source and a previous prototype compact source (Kei source). The Kei2 source has a diameter of 320mm and a length of 295mm. The beam intensity of C4+ was obtained to be 530μA under an extraction voltage of 40kV. The beam stability was better than 6% at C4+ of 280μA during 90h with no adjustment of the operation parameters. The details of the design and beam tests of the source are described in this paper.

ECR Plasma Source for Heavy Ion Beam Charge Neutralization

NASA Astrophysics Data System (ADS)

Efthimion, P. C.; Gilson, E.; Grishman, L.; Kolchin, P.; Davidson, R. C.

2002-01-01

Highly ionized plasmas are being considered as a medium for charge neutralizing heavy ion beams in order to focus beyond the space-charge limit. Calculations suggest that plasma at a density of 1 - 100 times the ion beam density and at a length of approximately 0.1-2 m would be suitable for achieving a high level of charge neutralization. An ECR source has been built at the Princeton Plasma Physics Laboratory (PPPL) to support a joint Neutralized Transport Experiment (NTX) at the Lawrence Berkeley National Laboratory (LBNL) to study ion beam neutralization with plasma. The ECR source operates at 13.6 MHz and with solenoid magnetic fields of 1-10 gauss. The goal is to operate the source at pressures of approximately 10-6 torr at full ionization. The initial operation of the source has been at pressures of 10-4 - 10-1. Electron densities in the range of 108 - 1011 per cubic centimeter have been achieved. Low-pressure operation is important to reduce ion beam ionization. A cusp magnetic field has been installed to improve radial confinement and reduce the field strength on the beam axis. In addition, axial confinement is believed to be important to achieve lower-pressure operation. To further improve breakdown at low pressure, a weak electron source will be placed near the end of the ECR source.

The study towards high intensity high charge state laser ion sources.

PubMed

Zhao, H Y; Jin, Q Y; Sha, S; Zhang, J J; Li, Z M; Liu, W; Sun, L T; Zhang, X Z; Zhao, H W

2014-02-01

As one of the candidate ion sources for a planned project, the High Intensity heavy-ion Accelerator Facility, a laser ion source has been being intensively studied at the Institute of Modern Physics in the past two years. The charge state distributions of ions produced by irradiating a pulsed 3 J/8 ns Nd:YAG laser on solid targets of a wide range of elements (C, Al, Ti, Ni, Ag, Ta, and Pb) were measured with an electrostatic ion analyzer spectrometer, which indicates that highly charged ions could be generated from low-to-medium mass elements with the present laser system, while the charge state distributions for high mass elements were relatively low. The shot-to-shot stability of ion pulses was monitored with a Faraday cup for carbon target. The fluctuations within ±2.5% for the peak current and total charge and ±6% for pulse duration were demonstrated with the present setup of the laser ion source, the suppression of which is still possible.

Electron energy recovery system for negative ion sources

DOEpatents

Dagenhart, William K.; Stirling, William L.

1982-01-01

An electron energy recovery system for negative ion sources is provided. The system, employs crossed electric and magnetic fields to separate the electrons from ions as they are extracted from a negative ion source plasma generator and before the ions are accelerated to their full kinetic energy. With the electric and magnetic fields oriented 90.degree. to each other, the electrons are separated from the plasma and remain at approximately the electrical potential of the generator in which they were generated. The electrons migrate from the ion beam path in a precessing motion out of the ion accelerating field region into an electron recovery region provided by a specially designed electron collector electrode. The electron collector electrode is uniformly spaced from a surface of the ion generator which is transverse to the direction of migration of the electrons and the two surfaces are contoured in a matching relationship which departs from a planar configuration to provide an electric field component in the recovery region which is parallel to the magnetic field thereby forcing the electrons to be directed into and collected by the electron collector electrode. The collector electrode is maintained at a potential slightly positive with respect to the ion generator so that the electrons are collected at a small fraction of the full accelerating supply voltage energy.

Ion plating with an induction heating source

NASA Technical Reports Server (NTRS)

Spalvins, T.; Brainard, W. A.

1976-01-01

Induction heating is introduced as an evaporation heat source in ion plating. A bare induction coil without shielding can be directly used in the glow discharge region with no arcing. The only requirement is to utilize an rf inductive generator with low operating frequency of 75 kHz. Mechanical simplicity of the ion plating apparatus and ease of operation is a great asset for industrial applications; practically any metal such as nickel, iron, and the high temperature refractories can be evaporated and ion plated.

Multi-cathode metal vapor arc ion source

DOEpatents

Brown, Ian G.; MacGill, Robert A.

1988-01-01

An ion generating apparatus utilizing a vacuum chamber, a cathode and an anode in the chamber. A source of electrical power produces an arc or discharge between the cathode and anode. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma is directed to an extractor which separates the electrons from the plasma, and accelerates the ions to produce an ion beam. One embodiment of the appaatus utilizes a multi-cathode arrangement for interaction with the anode.

Nitrogen Gas Field Ion Source (GFIS) Focused Ion Beam (FIB) Secondary Electron Imaging: A First Look.

PubMed

Schmidt, Marek E; Yasaka, Anto; Akabori, Masashi; Mizuta, Hiroshi

2017-08-01

The recent technological advance of the gas field ion source (GFIS) and its successful integration into systems has renewed the interest in the focused ion beam (FIB) technology. Due to the atomically small source size and the use of light ions, the limitations of the liquid metal ion source are solved as device dimensions are pushed further towards the single-digit nanometer size. Helium and neon ions are the most widely used, but a large portfolio of available ion species is desirable, to allow a wide range of applications. Among argon and hydrogen, $${\\rm N}_{2}^{{\\plus}} $$ ions offer unique characteristics due to their covalent bond and their use as dopant for various carbon-based materials including diamond. Here, we provide a first look at the $${\\rm N}_{2}^{{\\plus}} $$ GFIS-FIB enabled imaging of a large selection of microscopic structures, including gold on carbon test specimen, thin metal films on insulator and nanostructured carbon-based devices, which are among the most actively researched materials in the field of nanoelectronics. The results are compared with images acquired by He+ ions, and we show that $${\\rm N}_{2}^{{\\plus}} $$ GFIS-FIB can offer improved material contrast even at very low imaging dose and is more sensitive to the surface roughness.

Survey of ion plating sources. [conferences

NASA Technical Reports Server (NTRS)

Spalvins, T.

1979-01-01

Based on the type of evaporation source, gaseous media and mode of transport, the following is discussed: resistance, electron beam, sputtering, reactive and ion beam evaporation. Ionization efficiencies and ion energies in the glow discharge determine the percentage of atoms which are ionized under typical ion plating conditions. The plating flux consists of a small number of energetic ions and a large number of energetic neutrals. The energy distribution ranges from thermal energies up to a maximum energy of the discharge. The various reaction mechanisms which contribute to the exceptionally strong adherence - formation of a graded sustrate/coating interface are not fully understood, however the controlling factors are evaluated. The influence of process variables on the nucleation and growth characteristics are illustrated in terms of morphological changes which affect the mechanical and tribological properties of the coating.

ION SOURCE FOR A CALUTRON

DOEpatents

Lofgren, E.J.

1959-04-14

This patcnt relates to calutron devices and deals particularly with the mechanism used to produce the beam of ions wherein a charge material which is a vapor at room temperature is used. A charge container located outside the tank is connected through several conduits to various points along the arc chamber of the ion source. In addition, the rate of flow of the vapor to the arc chamber is controlled by a throttle valve in each conduit. By this arrangement the arc can be regulated accurately and without appreciable time lag, inasmuch as the rate of vapor flow is immediately responsive to the manipulation of the throttle valves.

Elements and inorganic ions as source tracers in recent Greenland snow

NASA Astrophysics Data System (ADS)

Lai, Alexandra M.; Shafer, Martin M.; Dibb, Jack E.; Polashenski, Chris M.; Schauer, James J.

2017-09-01

Atmospheric transport of aerosols leads to deposition of impurities in snow, even in areas of the Arctic as remote as Greenland. Major ions (e.g. Na+, Ca2+, NH4+, K+, SO42-) are frequently used as tracers for common aerosol sources (e.g. sea spray, dust, biomass burning, anthropogenic emissions). Trace element data can supplement tracer ion data by providing additional information about sources. Although many studies have considered either trace elements or major ions, few have reported both. This study determined total and water-soluble concentrations of 31 elements (Al, As, Ca, Cd, Ce, Co, Cr, Dy, Eu, Fe, Gd, K, La, Mg, Mn, Na, Nb, Nd, Pb, Pr, S, Sb, Si, Sm, Sn, Sr, Ti, V, U, Y, Zn) in shallow snow pits at 22 sampling sites in Greenland, along a transect from Summit Station to sites in the northwest. Black carbon (BC) and inorganic ions were measured in colocated samples. Sodium, which is typically used as a tracer of sea spray, did not appear to have any non-marine sources. The rare earth elements, alkaline earth elements (Mg, Ca, Sr), and other crustal elements (Fe, Si, Ti, V) were not enriched above crustal abundances relative to Al, indicating that these elements are primarily dust sourced. Calculated ratios of non-sea salt Ca (nssCa) to estimated dust mass affirm the use of nssCa as a dust tracer, but suggest up to 50% uncertainty in that estimate in the absence of other crustal element data. Crustal enrichment factors indicated that As, Cd, Pb, non-sea-salt S, Sb, Sn, and Zn were enriched in these samples, likely by anthropogenic sources. Principal component analysis indicated more than one crustal factor, and a variety of factors related to anthropogenically enriched elements. Analysis of trace elements alongside major tracer ions does not change interpretation of ion-based source attribution for sources that are well-characterized by ions, but is valuable for assessing uncertainty in source attribution and identifying sources not represented by major ions.

Investigation of helicon ion source extraction systems.

PubMed

Mordyk, S; Miroshnichenko, V; Shulha, D; Storizhko, V

2008-02-01

Various versions of an extraction system for a helicon ion source have been investigated in high plasma density (>10(12) cm(-3)) modes. The measurements of the plasma density were carried out with a microwave interferometer. Experiments were performed with hydrogen and helium gases. The preliminary results indicate that specially designed extractors are very promising for improving ion beam paraxial brightness.

Analysis of the spatial non-uniformity of negative ion production in surface-produced negative ion sources

NASA Astrophysics Data System (ADS)

Fujita, S.; Yamamoto, T.; Yoshida, M.; Onai, M.; Kojima, A.; Hatayama, A.; Kashiwagi, M.

2017-08-01

In order to improve the uniformity of the negative ion production, the KEIO-MARC code has been applied to the QST's JT60SA negative ion source in three different magnetic configurations (i) MC-PGMF (Multi-Cusp and PG Magnetic Filter), (ii) TNT-MF (TeNT Magnetic Filter) and (iii) MTNT-MF (Modified TeNT Magnetic Filter). From the results, we have confirmed that the electron rotation inside the negative ion source is an essential element in order to obtain a uniform production of the negative ions. By adding extra tent magnets on the longitudinal sides, the electron rotation has been enhanced, and a uniform production of negative ions has been realized.

Development and characterization of a high-reliability, extended-lifetime H- ion source

NASA Astrophysics Data System (ADS)

Becerra, Gabriel; Barrows, Preston; Sherman, Joseph

2015-11-01

Phoenix Nuclear Labs (PNL) has designed and constructed a long-lifetime, negative hydrogen (H-) ion source, in partnership with Fermilab for an ion beam injector servicing future Intensity Frontier particle accelerators. The specifications for the low-energy beam transport (LEBT) section are 5-10 mA of continuous H- ion current at 30 keV with <0.2 π-mm-mrad emittance. Existing ion sources at Fermilab rely on plasma-facing electrodes, limiting their lifetime to a few hundred hours, while requiring relatively high gas loads on downstream components. PNL's design features an electron cyclotron resonance (ECR) microwave plasma driver which has been extensively developed in positive ion source systems, having demonstrated 1000+ hours of operation and >99% continuous uptime at PNL. Positive ions and hyperthermal neutrals drift toward a low-work-function surface, where a fraction is converted into H- hydrogen ions, which are subsequently extracted into a low-energy beam using electrostatic lenses. A magnetic filter preferentially removes high-energy electrons emitted by the source plasma, in order to mitigate H- ion destruction via electron-impact detachment. The design of the source subsystems and preliminary diagnostic results will be presented.

New development of laser ion source for highly charged ion beam production at Institute of Modern Physics (invited).

PubMed

Zhao, H Y; Zhang, J J; Jin, Q Y; Liu, W; Wang, G C; Sun, L T; Zhang, X Z; Zhao, H W

2016-02-01

A laser ion source based on Nd:YAG laser has been being studied at the Institute of Modern Physics for the production of high intensity high charge state heavy ion beams in the past ten years, for possible applications both in a future accelerator complex and in heavy ion cancer therapy facilities. Based on the previous results for the production of multiple-charged ions from a wide range of heavy elements with a 3 J/8 ns Nd:YAG laser [Zhao et al., Rev. Sci. Instrum. 85, 02B910 (2014)], higher laser energy and intensity in the focal spot are necessary for the production of highly charged ions from the elements heavier than aluminum. Therefore, the laser ion source was upgraded with a new Nd:YAG laser, the maximum energy of which is 8 J and the pulse duration can be adjusted from 8 to 18 ns. Since then, the charge state distributions of ions from various elements generated by the 8 J Nd:YAG laser were investigated for different experimental conditions, such as laser energy, pulse duration, power density in the focal spot, and incidence angle. It was shown that the incidence angle is one of the most important parameters for the production of highly charged ions. The capability of producing highly charged ions from the elements lighter than silver was demonstrated with the incidence angle of 10° and laser power density of 8 × 10(13) W cm(-2) in the focal spot, which makes a laser ion source complementary to the superconducting electron cyclotron resonance ion source for the future accelerator complex especially in terms of the ion beam production from some refractory elements. Nevertheless, great efforts with regard to the extraction of intense ion beams, modification of the ion beam pulse duration, and reliability of the ion source still need to be made for practical applications.

New development of laser ion source for highly charged ion beam production at Institute of Modern Physics (invited)

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhao, H. Y., E-mail: zhaohy@impcas.ac.cn; Zhang, J. J.; Jin, Q. Y.

2016-02-15

A laser ion source based on Nd:YAG laser has been being studied at the Institute of Modern Physics for the production of high intensity high charge state heavy ion beams in the past ten years, for possible applications both in a future accelerator complex and in heavy ion cancer therapy facilities. Based on the previous results for the production of multiple-charged ions from a wide range of heavy elements with a 3 J/8 ns Nd:YAG laser [Zhao et al., Rev. Sci. Instrum. 85, 02B910 (2014)], higher laser energy and intensity in the focal spot are necessary for the production ofmore » highly charged ions from the elements heavier than aluminum. Therefore, the laser ion source was upgraded with a new Nd:YAG laser, the maximum energy of which is 8 J and the pulse duration can be adjusted from 8 to 18 ns. Since then, the charge state distributions of ions from various elements generated by the 8 J Nd:YAG laser were investigated for different experimental conditions, such as laser energy, pulse duration, power density in the focal spot, and incidence angle. It was shown that the incidence angle is one of the most important parameters for the production of highly charged ions. The capability of producing highly charged ions from the elements lighter than silver was demonstrated with the incidence angle of 10° and laser power density of 8 × 10{sup 13} W cm{sup −2} in the focal spot, which makes a laser ion source complementary to the superconducting electron cyclotron resonance ion source for the future accelerator complex especially in terms of the ion beam production from some refractory elements. Nevertheless, great efforts with regard to the extraction of intense ion beams, modification of the ion beam pulse duration, and reliability of the ion source still need to be made for practical applications.« less

Development of a compact filament-discharge multi-cusp H- ion source.

PubMed

Jia, XianLu; Zhang, TianJue; Zheng, Xia; Qin, JiuChang

2012-02-01

A 14 MeV medical cyclotron with the external ion source has been designed and is being constructed at China Institute of Atomic Energy. The H(-) ion will be accelerated by this machine and the proton beam will be extracted by carbon strippers in dual opposite direction. The compact multi-cusp H(-) ion source has been developed for the cyclotron. The 79.5 mm long ion source is 48 mm in diameter, which is consisting of a special shape filament, ten columns of permanent magnets providing a multi-cusp field, and a three-electrode extraction system. So far, the 3 mA∕25 keV H(-) beam with an emittance of 0.3 π mm mrad has been obtained from the ion source. The paper gives the design details and the beam test results. Further experimental study is under way and an extracted beam of 5 mA is expected.

Focused ion beam source method and apparatus

DOEpatents

Pellin, Michael J.; Lykke, Keith R.; Lill, Thorsten B.

2000-01-01

A focused ion beam having a cross section of submicron diameter, a high ion current, and a narrow energy range is generated from a target comprised of particle source material by laser ablation. The method involves directing a laser beam having a cross section of critical diameter onto the target, producing a cloud of laser ablated particles having unique characteristics, and extracting and focusing a charged particle beam from the laser ablated cloud. The method is especially suited for producing focused ion beams for semiconductor device analysis and modification.

Improvements for extending the time between maintenance periods for the Heidelberg ion beam therapy center (HIT) ion sources.

PubMed

Winkelmann, Tim; Cee, Rainer; Haberer, Thomas; Naas, Bernd; Peters, Andreas; Schreiner, Jochen

2014-02-01

The clinical operation at the Heidelberg Ion Beam Therapy Center (HIT) started in November 2009; since then more than 1600 patients have been treated. In a 24/7 operation scheme two 14.5 GHz electron cyclotron resonance ion sources are routinely used to produce protons and carbon ions. The modification of the low energy beam transport line and the integration of a third ion source into the therapy facility will be shown. In the last year we implemented a new extraction system at all three sources to enhance the lifetime of extraction parts and reduce preventive and corrective maintenance. The new four-electrode-design provides electron suppression as well as lower beam emittance. Unwanted beam sputtering effects which typically lead to contamination of the insulator ceramics and subsequent high-voltage break-downs are minimized by the beam guidance of the new extraction system. By this measure the service interval can be increased significantly. As a side effect, the beam emittance can be reduced allowing a less challenging working point for the ion sources without reducing the effective beam performance. This paper gives also an outlook to further enhancements at the HIT ion source testbench.

Intense beam production of highly charged heavy ions by the superconducting electron cyclotron resonance ion source SECRAL (invited)a)

NASA Astrophysics Data System (ADS)

Zhao, H. W.; Sun, L. T.; Zhang, X. Z.; Guo, X. H.; Cao, Y.; Lu, W.; Zhang, Z. M.; Yuan, P.; Song, M. T.; Zhao, H. Y.; Jin, T.; Shang, Y.; Zhan, W. L.; Wei, B. W.; Xie, D. Z.

2008-02-01

There has been increasing demand to provide higher beam intensity and high enough beam energy for heavy ion accelerator and some other applications, which has driven electron cyclotron resonance (ECR) ion source to produce higher charge state ions with higher beam intensity. One of development trends for highly charged ECR ion source is to build new generation ECR sources by utilization of superconducting magnet technology. SECRAL (superconducting ECR ion source with advanced design in Lanzhou) was successfully built to produce intense beams of highly charged ion for Heavy Ion Research Facility in Lanzhou (HIRFL). The ion source has been optimized to be operated at 28GHz for its maximum performance. The superconducting magnet confinement configuration of the ion source consists of three axial solenoid coils and six sextupole coils with a cold iron structure as field booster and clamping. An innovative design of SECRAL is that the three axial solenoid coils are located inside of the sextupole bore in order to reduce the interaction forces between the sextupole coils and the solenoid coils. For 28GHz operation, the magnet assembly can produce peak mirror fields on axis of 3.6T at injection, 2.2T at extraction, and a radial sextupole field of 2.0T at plasma chamber wall. During the commissioning phase at 18GHz with a stainless steel chamber, tests with various gases and some metals have been conducted with microwave power less than 3.5kW by two 18GHz rf generators. It demonstrates the performance is very promising. Some record ion beam intensities have been produced, for instance, 810eμA of O7+, 505eμA of Xe20+, 306eμA of Xe27+, and so on. The effect of the magnetic field configuration on the ion source performance has been studied experimentally. SECRAL has been put into operation to provide highly charged ion beams for HIRFL facility since May 2007.

Electron cyclotron resonance ion sources with arc-shaped coils.

PubMed

Suominen, P; Wenander, F

2008-02-01

The minimum-B magnetic field structure of electron cyclotron resonance ion sources (ECRIS) has conventionally been formed with a combination of solenoids and a hexapole magnet. However, minimum-B structure can also be formed with arc-shaped coils. Recently it was shown that multiply charged heavy-ions can be produced with an ECRIS based on such a structure. In the future, the ARC-ECRIS magnetic field structure can be an interesting option for radioactive ion-beam sources and charge-breeders as well as for high performance ECRIS allowing for 100 GHz plasma heating. This paper presents some design aspects of the ARC-ECRIS.

RF absorption and ion heating in helicon sources.

PubMed

Kline, J L; Scime, E E; Boivin, R F; Keesee, A M; Sun, X; Mikhailenko, V S

2002-05-13

Experimental data are presented that are consistent with the hypothesis that anomalous rf absorption in helicon sources is due to electron scattering arising from parametrically driven ion-acoustic waves downstream from the antenna. Also presented are ion temperature measurements demonstrating anisotropic heating (T( perpendicular)>T(parallel)) at the edge of the discharge. The most likely explanation is ion-Landau damping of electrostatic slow waves at a local lower-hybrid-frequency resonance.

Resonance ionization laser ion sources for on-line isotope separators (invited).

PubMed

Marsh, B A

2014-02-01

A Resonance Ionization Laser Ion Source (RILIS) is today considered an essential component of the majority of Isotope Separator On Line (ISOL) facilities; there are seven laser ion sources currently operational at ISOL facilities worldwide and several more are under development. The ionization mechanism is a highly element selective multi-step resonance photo-absorption process that requires a specifically tailored laser configuration for each chemical element. For some isotopes, isomer selective ionization may even be achieved by exploiting the differences in hyperfine structures of an atomic transition for different nuclear spin states. For many radioactive ion beam experiments, laser resonance ionization is the only means of achieving an acceptable level of beam purity without compromising isotope yield. Furthermore, by performing element selection at the location of the ion source, the propagation of unwanted radioactivity downstream of the target assembly is reduced. Whilst advances in laser technology have improved the performance and reliability of laser ion sources and broadened the range of suitable commercially available laser systems, many recent developments have focused rather on the laser/atom interaction region in the quest for increased selectivity and/or improved spectral resolution. Much of the progress in this area has been achieved by decoupling the laser ionization from competing ionization processes through the use of a laser/atom interaction region that is physically separated from the target chamber. A new application of gas catcher laser ion source technology promises to expand the capabilities of projectile fragmentation facilities through the conversion of otherwise discarded reaction fragments into high-purity low-energy ion beams. A summary of recent RILIS developments and the current status of laser ion sources worldwide is presented.

Characterization of Magnetron Sputtered Copper-Nickel Thin Film and Alloys

DTIC Science & Technology

2016-09-01

ARL-TR-7783 ● SEP 2016 US Army Research Laboratory Characterization of Magnetron Sputtered Copper-Nickel Thin Films and Alloys...TR-7783 ● SEP 2016 US Army Research Laboratory Characterization of Magnetron Sputtered Copper-Nickel Thin Films and Alloys by Eugene...

Charging of nanoparticles in stationary plasma in a gas aggregation cluster source

NASA Astrophysics Data System (ADS)

Blažek, J.; Kousal, J.; Biederman, H.; Kylián, O.; Hanuš, J.; Slavínská, D.

2015-10-01

Clusters that grow into nanoparticles near the magnetron target of the gas aggregation cluster source (GAS) may acquire electric charge by collecting electrons and ions or through other mechanisms like secondary- or photo-electron emissions. The region of the GAS close to magnetron may be considered as stationary plasma. The steady state charge distribution on nanoparticles can be determined by means of three possible models—fluid model, kinetic model and model employing Monte Carlo simulations—of cluster charging. In the paper the mathematical and numerical aspects of these models are analyzed in detail and close links between them are clarified. Among others it is shown that Monte Carlo simulation may be considered as a particular numerical technique of solving kinetic equations. Similarly the equations of the fluid model result, after some approximation, from averaged kinetic equations. A new algorithm solving an in principle unlimited set of kinetic equations is suggested. Its efficiency is verified on physical models based on experimental input data.

Neutral gas rotation in magnetron discharge

NASA Astrophysics Data System (ADS)

Pal, A. F.; Ryabinkin, A. N.; Serov, A. O.; Filippov, A. V.

2014-12-01

We have experimentally established the existence and determined the velocity of motion of the neutral component of plasma in a planar magnetron discharge, which takes place in the direction of drift of the charged plasma component in crossed electric and magnetic ( E × B) fields. For this purpose, we have studied the propagation of a small gaseous additive over the plasma ring of dc magnetron discharge in the diffusion regime. The obtained temporal dependences of the intensity of atomic emission spectra of the additive in various regions of the plasma ring are compared to the results of numerical solution of the diffusion equation for the experimental conditions studied.

High power microwave source development

NASA Astrophysics Data System (ADS)

Benford, James N.; Miller, Gabriel; Potter, Seth; Ashby, Steve; Smith, Richard R.

1995-05-01

The requirements of this project have been to: (1) improve and expand the sources available in the facility for testing purposes and (2) perform specific tasks under direction of the Defense Nuclear Agency about the applications of high power microwaves (HPM). In this project the HPM application was power beaming. The requirements of this program were met in the following way: (1) We demonstrated that a compact linear induction accelerator can drive HPM sources at repetition rates in excess of 100 HZ at peak microwave powers of a GW. This was done for the relativistic magnetron. Since the conclusion of this contract such specifications have also been demonstrated for the relativistic klystron under Ballistic Missile Defense Organization funding. (2) We demonstrated an L band relativistic magnetron. This device has been used both on our single pulse machines, CAMEL and CAMEL X, and the repetitive system CLIA. (3) We demonstrated that phase locking of sources together in large numbers is a feasible technology and showed the generation of multigigawatt S-band radiation in an array of relativistic magnetrons.

The direct injection of intense ion beams from a high field electron cyclotron resonance ion source into a radio frequency quadrupole

NASA Astrophysics Data System (ADS)

Rodrigues, G.; Becker, R.; Hamm, R. W.; Baskaran, R.; Kanjilal, D.; Roy, A.

2014-02-01

The ion current achievable from high intensity ECR sources for highly charged ions is limited by the high space charge. This makes classical extraction systems for the transport and subsequent matching to a radio frequency quadrupole (RFQ) accelerator less efficient. The direct plasma injection (DPI) method developed originally for the laser ion source avoids these problems and uses the combined focusing of the gap between the ion source and the RFQ vanes (or rods) and the focusing of the rf fields from the RFQ penetrating into this gap. For high performance ECR sources that use superconducting solenoids, the stray magnetic field of the source in addition to the DPI scheme provides focusing against the space charge blow-up of the beam. A combined extraction/matching system has been designed for a high performance ECR ion source injecting into an RFQ, allowing a total beam current of 10 mA from the ion source for the production of highly charged 238U40+ (1.33 mA) to be injected at an ion source voltage of 60 kV. In this design, the features of IGUN have been used to take into account the rf-focusing of an RFQ channel (without modulation), the electrostatic field between ion source extraction and the RFQ vanes, the magnetic stray field of the ECR superconducting solenoid, and the defocusing space charge of an ion beam. The stray magnetic field is shown to be critical in the case of a matched beam.

The direct injection of intense ion beams from a high field electron cyclotron resonance ion source into a radio frequency quadrupole.

PubMed

Rodrigues, G; Becker, R; Hamm, R W; Baskaran, R; Kanjilal, D; Roy, A

2014-02-01

The ion current achievable from high intensity ECR sources for highly charged ions is limited by the high space charge. This makes classical extraction systems for the transport and subsequent matching to a radio frequency quadrupole (RFQ) accelerator less efficient. The direct plasma injection (DPI) method developed originally for the laser ion source avoids these problems and uses the combined focusing of the gap between the ion source and the RFQ vanes (or rods) and the focusing of the rf fields from the RFQ penetrating into this gap. For high performance ECR sources that use superconducting solenoids, the stray magnetic field of the source in addition to the DPI scheme provides focusing against the space charge blow-up of the beam. A combined extraction/matching system has been designed for a high performance ECR ion source injecting into an RFQ, allowing a total beam current of 10 mA from the ion source for the production of highly charged (238)U(40+) (1.33 mA) to be injected at an ion source voltage of 60 kV. In this design, the features of IGUN have been used to take into account the rf-focusing of an RFQ channel (without modulation), the electrostatic field between ion source extraction and the RFQ vanes, the magnetic stray field of the ECR superconducting solenoid, and the defocusing space charge of an ion beam. The stray magnetic field is shown to be critical in the case of a matched beam.

High voltage holding in the negative ion sources with cesium deposition

DOE Office of Scientific and Technical Information (OSTI.GOV)

Belchenko, Yu.; Abdrashitov, G.; Ivanov, A.

High voltage holding of the large surface-plasma negative ion source with cesium deposition was studied. It was found that heating of ion-optical system electrodes to temperature >100 °C facilitates the source conditioning by high voltage pulses in vacuum and by beam shots. The procedure of electrode conditioning and the data on high-voltage holding in the negative ion source with small cesium seed are described. The mechanism of high voltage holding improvement by depletion of cesium coverage is discussed.

Verification of high efficient broad beam cold cathode ion source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Abdel Reheem, A. M., E-mail: amreheem2009@yahoo.com; Radiation Physics Department, National Center for Radiation Research and Technology; Ahmed, M. M.

2016-08-15

An improved form of cold cathode ion source has been designed and constructed. It consists of stainless steel hollow cylinder anode and stainless steel cathode disc, which are separated by a Teflon flange. The electrical discharge and output characteristics have been measured at different pressures using argon, nitrogen, and oxygen gases. The ion exit aperture shape and optimum distance between ion collector plate and cathode disc are studied. The stable discharge current and maximum output ion beam current have been obtained using grid exit aperture. It was found that the optimum distance between ion collector plate and ion exit aperturemore » is equal to 6.25 cm. The cold cathode ion source is used to deposit aluminum coating layer on AZ31 magnesium alloy using argon ion beam current which equals 600 μA. Scanning electron microscope and X-ray diffraction techniques used for characterizing samples before and after aluminum deposition.« less

Ion Heating and Flows in a High Power Helicon Source

NASA Astrophysics Data System (ADS)

Scime, Earl; Agnello, Riccardo; Furno, Ivo; Howling, Alan; Jacquier, Remy; Plyushchev, Gennady; Thompson, Derek

2017-10-01

We report experimental measurements of ion temperatures and flows in a high power, linear, magnetized, helicon plasma device, the Resonant Antenna Ion Device (RAID). RAID is equipped with a high power helicon source. Parallel and perpendicular ion temperatures on the order of 0.6 eV are observed for an rf power of 4 kW, suggesting that higher power helicon sources should attain ion temperatures in excess of 1 eV. The unique RAID antenna design produces broad, uniform plasma density and perpendicular ion temperature radial profiles. Measurements of the azimuthal flow indicate rigid body rotation of the plasma column of a few kHz. When configured with an expanding magnetic field, modest parallel ion flows are observed in the expansion region. The ion flows and temperatures are derived from laser induced fluorescence measurements of the Doppler resolved velocity distribution functions of argon ions. This work supported by U.S. National Science Foundation Grant No. PHY-1360278.

Development progresses of radio frequency ion source for neutral beam injector in fusion devices.

PubMed

Chang, D H; Jeong, S H; Kim, T S; Park, M; Lee, K W; In, S R

2014-02-01

A large-area RF (radio frequency)-driven ion source is being developed in Germany for the heating and current drive of an ITER device. Negative hydrogen ion sources are the major components of neutral beam injection systems in future large-scale fusion experiments such as ITER and DEMO. RF ion sources for the production of positive hydrogen (deuterium) ions have been successfully developed for the neutral beam heating systems at IPP (Max-Planck-Institute for Plasma Physics) in Germany. The first long-pulse ion source has been developed successfully with a magnetic bucket plasma generator including a filament heating structure for the first NBI system of the KSTAR tokamak. There is a development plan for an RF ion source at KAERI to extract the positive ions, which can be applied for the KSTAR NBI system and to extract the negative ions for future fusion devices such as the Fusion Neutron Source and Korea-DEMO. The characteristics of RF-driven plasmas and the uniformity of the plasma parameters in the test-RF ion source were investigated initially using an electrostatic probe.

High temperature ion source for an on-line isotope separator

DOEpatents

Mlekodaj, Ronald L.

1979-01-01

A reduced size ion source for on-line use with a cyclotron heavy-ion beam is provided. A sixfold reduction in source volume while operating with similar input power levels results in a 2000.degree. C. operating temperature. A combined target/window normally provides the reaction products for ionization while isolating the ion source plasma from the cyclotron beam line vacuum. A graphite felt catcher stops the recoiling reaction products and releases them into the plasma through diffusion and evaporation. Other target arrangements are also possible. A twenty-four hour lifetime of unattended operation is achieved, and a wider range of elements can be studied than was heretofore possible.

Method for the production of atomic ion species from plasma ion sources

DOEpatents

Spence, David; Lykke, Keith

1998-01-01

A technique to enhance the yield of atomic ion species (H.sup.+, D.sup.+, O.sup.+, N.sup.+, etc.) from plasma ion sources. The technique involves the addition of catalyzing agents to the ion discharge. Effective catalysts include H.sub.2 O, D.sub.2 O, O.sub.2, and SF.sub.6, among others, with the most effective being water (H.sub.2 O) and deuterated water (D.sub.2 O). This technique has been developed at Argonne National Laboratory, where microwave generated plasmas have produced ion beams comprised of close to 100% purity protons (H.sup.+) and close to 100% purity deuterons (D.sup.+). The technique also increases the total yield of protons and deuterons by converting unwanted ion species, namely, H.sub.2.sup.+,H.sub.3.sup.+ and D.sub.2.sup.+, D.sub.3.sup.+, into the desired ion species, H.sup.+ and D.sup.+, respectively.

Investigations of the emittance and brightness of ion beams from an electron beam ion source of the Dresden EBIS type.

PubMed

Silze, Alexandra; Ritter, Erik; Zschornack, Günter; Schwan, Andreas; Ullmann, Falk

2010-02-01

We have characterized ion beams extracted from the Dresden EBIS-A, a compact room-temperature electron beam ion source (EBIS) with a permanent magnet system for electron beam compression, using a pepper-pot emittance meter. The EBIS-A is the precursor to the Dresden EBIS-SC in which the permanent magnets have been replaced by superconducting solenoids for the use of the source in high-ion-current applications such as heavy-ion cancer therapy. Beam emittance and brightness values were calculated from data sets acquired for a variety of source parameters, in leaky as well as pulsed ion extraction mode. With box shaped pulses of C(4+) ions at an energy of 39 keV root mean square emittances of 1-4 mm mrad and a brightness of 10 nA mm(-2) mrad(-2) were achieved. The results meet the expectations for high quality ion beams generated by an electron beam ion source.

Ion source based on the cathodic arc

DOEpatents

Sanders, David M.; Falabella, Steven

1994-01-01

A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles.

Optical sideband spectroscopy of a single ion in a Penning trap

NASA Astrophysics Data System (ADS)

Mavadia, S.; Stutter, G.; Goodwin, J. F.; Crick, D. R.; Thompson, R. C.; Segal, D. M.

2014-03-01

We perform resolved optical sideband spectroscopy on a single 40Ca+ ion in a Penning trap. We probe the electric quadrupole allowed S1/2↔D5/2 transition at 729 nm and observe equally spaced sidebands for the three motional modes. The axial mode, parallel to the trap axis, is a one-dimensional harmonic oscillator, whereas the radial cyclotron and magnetron modes are circular motions perpendicular to the magnetic field. The total energy associated with the magnetron motion is negative, but here we probe only the (positive) kinetic energy. From the equivalent Doppler widths of the sideband spectra corresponding to the three motions we find effective temperatures of 1.1±0.2 mK, 7±3 mK, and 42±8 μK for the axial, modified cyclotron, and magnetron modes, respectively. These should be compared to the cooling limits, estimated using optimal laser parameters, of 0.38 mK, 0.8 mK, and ˜10 μK. In future work we aim to perform resolved-sideband cooling of the ion on the 729-nm transition.