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Sample records for masked helium implantation

  1. Patterned Exfoliation of GaAs Based on Masked Helium Implantation and Subsequent Rapid Thermal Annealing

    SciTech Connect

    Woo, H. J.; Choi, H. W.; Kim, G. D.; Hong, W.; Kim, J. K.

    2009-03-10

    A method of patterning single crystal GaAs based on ion implantation induced selective area exfoliation is suggested. Samples were implanted with 200-500 keV helium ions to a fluence range of 2-4x10{sup 16} He{sup +}/cm{sup 2} at room temperature through masks of Ni mesh (40 {mu}m opening) or stainless steel wire (50 {mu}m in diameter), and subsequent rapid thermal annealing at 350-500{open_square} resulted in expulsion of ion beam exposed material. The influences of ion energy, ion fluence, implantation temperature, subsequent annealing conditions (temperature and ramp rate), and mask pattern and its orientation with GaAs lattice on the patterned exfoliation were examined.

  2. Patterned Exfoliation of GaAs Based on Masked Helium Implantation and Subsequent Rapid Thermal Annealing

    NASA Astrophysics Data System (ADS)

    Woo, H. J.; Choi, H. W.; Kim, G. D.; Hong, W.; Kim, J. K.

    2009-03-01

    A method of patterning single crystal GaAs based on ion implantation induced selective area exfoliation is suggested. Samples were implanted with 200-500 keV helium ions to a fluence range of 2-4×1016He+/cm2 at room temperature through masks of Ni mesh (40 μm opening) or stainless steel wire (50 μm in diameter), and subsequent rapid thermal annealing at 350-500□ resulted in expulsion of ion beam exposed material. The influences of ion energy, ion fluence, implantation temperature, subsequent annealing conditions (temperature and ramp rate), and mask pattern and its orientation with GaAs lattice on the patterned exfoliation were examined.

  3. Forward masking in different cochlear implant systems

    NASA Astrophysics Data System (ADS)

    Boëx, Colette; Kós, Maria-Izabel; Pelizzone, Marco

    2003-10-01

    The goal of this study was to evaluate, from a psychophysical standpoint, the neural spread of excitation produced by the stimulation of different types of intracochlear electrode arrays: the Ineraid™, the Clarion™ S-Series on its own or with the Electrode Positioning System (EPS), and the Clarion™ HiFocus-I with the EPS. The EPS is an independent silicone part designed to bring the electrode array close to the modiolus. Forward masking was evaluated in 12 adult subjects (3 Ineraid™, 4 Clarion™ S-Series, 3 Clarion™ S-Series+EPS, 3 HiFocus-I+EPS) by psychophysical experiments conducted using trains of biphasic stimuli (813 pulses per second, 307.6 μs/phase). Masker signals (+8 dB re: threshold, 300 ms) were applied to the most apical electrode. Probe signals (30 ms, 10-ms postmasker) were delivered to more basal electrodes. Masked and unmasked detection thresholds of probe signals were measured. For both Clarion™ HiFocus-I subjects, measurements were conducted in both monopolar and bipolar stimulus configurations. No major differences were found in forward masking between the different intracochlear electrode arrays tested in the monopolar configuration at suprathreshold levels equivalent to those used in speech-coding strategies, but significant differences were found between subjects. A significant negative correlation also was found between the level of forward masking and the consonant identification performance. These measurements showed that the neural spread of excitation was more restricted in the bipolar configuration than in the monopolar configuration for HiFocus-I subjects. It was found that CIS strategies implemented without using apical electrodes, which showed high levels of masking, could improve consonant identification.

  4. Multi-part mask for implanting workpieces

    DOEpatents

    Webb, Aaron P.; Carlson, Charles T.

    2016-05-10

    A multi-part mask has a pattern plate, which includes a planar portion that has the desired aperture pattern to be used during workpiece processing. The multi-part mask also has a mounting frame, which is used to hold the pattern plate. Prior to assembly, the pattern plate has an aligning portion, which has one or more holes through which reusable alignment pins are inserted. These alignment pins enter kinematic joints disposed on the mounting frame, which serve to precisely align the pattern plate to the mounting frame. After the pattern plate has been secured to the mounting frame, the aligning portion can be detached from the pattern plate. The alignment pins can be reused at a later time. In some embodiments, the pattern plate can later be removed from the mounting frame, so that the mounting frame may be reused.

  5. Helium and deuterium implantation in tungsten at elevated temperatures

    NASA Astrophysics Data System (ADS)

    Cipiti, B. B.; Kulcinski, G. L.

    2005-12-01

    High temperature helium and deuterium implantation on tungsten has been studied using the University of Wisconsin inertial electrostatic confinement device. Helium or deuterium ions from a plasma source were driven into polished tungsten powder metallurgy samples. Deuterium implantation did not damage the surface of the specimens at elevated temperatures (˜1200 °C). Helium implantation resulted in a porous surface structure above 700 °C. A helium fluence scan, ion energy scan, and temperature scan were all completed. With 30 keV ions, the pore formation started just below 4 × 10 16 He +/cm 2. The pore size increased and the pore density decreased with increasing fluence and temperature. The energy scan from 20 to 80 keV showed no consistent trend.

  6. Evolution of defects in silicon carbide implanted with helium ions

    NASA Astrophysics Data System (ADS)

    Zhang, Chonghong; Song, Yin; Yang, Yitao; Zhou, Chunlan; Wei, Long; Ma, Hongji

    2014-05-01

    Effects of accumulation of radiation damage in silicon carbide are important concerns for the use of silicon carbide in advanced nuclear energy systems. In the present work lattice damage in silicon carbide crystal (4H type) implanted with 100 keV 4He+ ions was investigated with Rutherford backscattering spectrometry in channeling geometry (RBS/c) and positron beam Doppler broadening spectrometry (PBDB). Helium implantation was performed at the specimen temperature of 510 K to avoid amorphization of the SiC crystal. Fluences of helium ions were selected to be in the range from 1 × 1016 to 3 × 1016 ions cm-2, around the dose threshold for the formation of observable helium bubbles under transmission electron microscopes (TEM). The RBS/c measurements show distinctly different annealing behavior of displaced Si atoms at doses below or above the threshold for helium bubble formation. The RBS/c yield in the peak damage region of the specimen implanted to 3 × 1016 He-ions cm-2 shows an increase on the subsequently thermal annealing above 873 K, which is readily ascribed to the extra displacement of Si atoms due to helium bubble growth. The RBS/c yield in the specimen implanted to a lower ion fluence of 1.5 × 1016 He-ions cm-2 decreases monotonously on annealing from ambient temperatures up to 1273 K. The PBDB measurements supply evidence of clustering of vacancies at temperatures from 510 to 1173 K, and dissociation of vacancy clusters above 1273 K. The similarity of annealing behavior in PBDB profiles for helium implantation to 1 × 1016 and 3 × 1016 ions cm-2 is ascribed to the saturation of trapping of positrons in vacancy type defects in the damaged layers in the specimens helium-implanted to the two dose levels.

  7. Lattice site of helium implanted in magnesium aluminate spinel

    NASA Astrophysics Data System (ADS)

    Alien, W. R.

    1993-01-01

    The lattice site of helium implanted at 60 keV in magnesium aluminate spinel (MgAl 2O 4) has been investigated with channeling effect measurements that apply the ion-induced 3He(d, p) 4He nuclear reaction. Within the spinel crystal structure, numerous interstices characterized by octahedral anion coordination are intrinsically unfilled by cations. For implantation at 300 K, a typical helium atom locates centrally in one of these vacant octahedral interstices with a probability of approximately 95%. Significant occupation of other lattice sites of either high or low symmetry was rejected. In particular, helium neither clusters in defect complexes nor locates in tetrahedral interstices or substitutional sites.

  8. Forward-masked spatial tuning curves in cochlear implant users

    PubMed Central

    Nelson, David A.; Donaldson, Gail S.; Kreft, Heather

    2008-01-01

    Forward-masked psychophysical spatial tuning curves (fmSTCs) were measured in twelve cochlear-implant subjects, six using bipolar stimulation (Nucleus devices)and six using monopolar stimulation (Clarion devices). fmSTCs were measured at several probe levels on a middle electrode using a fixed-level probe stimulus and variable-level maskers. The average fmSTC slopes obtained in subjects using bipolar stimulation (3.7 dB/mm) were approximately three times steeper than average slopes obtained in subjects using monopolar stimulation (1.2 dB/mm). Average spatial bandwidths were about half as wide for subjects with bipolar stimulation (2.6 mm) than for subjects with monopolar stimulation (4.6 mm). None of the tuning curve characteristics changed significantly with probe level. fmSTCs replotted in terms of acoustic frequency, using Greenwood’s [J. Acoust. Soc. Am. 33, 1344–1356 (1961)] frequency-to-place equation, were compared with forward-masked psychophysical tuning curves obtained previously from normal-hearing and hearing-impaired acoustic listeners. The average tuning characteristics of fmSTCs in electric hearing were similar to the broad tuning observed in normal-hearing and hearing-impaired acoustic listeners at high stimulus levels. This suggests that spatial tuning is not the primary factor limiting speech perception in many cochlear implant users. PMID:18345841

  9. Thermal desorption spectra from cavities in helium-implanted silicon

    NASA Astrophysics Data System (ADS)

    Cerofolini, G. F.; Calzolari, G.; Corni, F.; Frabboni, S.; Nobili, C.; Ottaviani, G.; Tonini, R.

    2000-04-01

    Thermal desorption spectra at constant ramp rate have been determined after helium implantation into bare silicon prepared for a large set of experimental conditions. The spectra can phenomenologically be classified as composed by two peaks: the α peak, centered on a temperature of 750-800°C with a shoulder extending to lower temperature (down to 550°C), and the β peak, centered on a lower temperature depending on the implantation-annealing conditions. The α peak is attributed to the emission from cavities, while the β peak is attributed to the emission from vacancylike defects. A detailed theory describing helium effusion from stable cavities as controlled by the interatomic helium-helium potential is proposed and found to reproduce accurately most of the α peaks. The postimplantation of hydrogen into samples displaying a pure β emission results in an α peak which can be described by the same model as above provided that the cavities are unstable and shrink during desorption in such a way as to maintain constant the concentration of contained helium.

  10. Evaluation of mask repair strategies via focused electron, helium, and neon beam induced processing for EUV applications

    NASA Astrophysics Data System (ADS)

    Gonzalez, C. M.; Slingenbergh, W.; Timilsina, R.; Noh, J.-H.; Stanford, M. G.; Lewis, B. B.; Klein, K. L.; Liang, T.; Fowlkes, J. D.; Rack, P. D.

    2014-04-01

    One critical area for EUV lithography is the development of appropriate mask repair strategies. To this end, we have explored etching repair strategies for nickel absorber layers and focused electron beam induced deposition of ruthenium capping layers. Nickel has higher EUV absorption than the standard TaN absorber layer and thus thinner films and improved optical quality can be realized. A thin (2.5 nm) ruthenium film is commonly used as a protective capping layer on the Mo-Si EUV multi-layer mirror which mechanically and chemically protects the multi-layers during standard mask-making procedures. The gas field ion (GFIS) microscope was used to investigate helium and neon ion beam induced etching (IBIE) of nickel as a candidate technique for EUV lithography mask editing. No discernable nickel etching was observed for helium, however transmission electron microscopy (TEM) revealed subsurface damage to the underlying Mo-Si multilayers. Subsequently, neon beam induced etching at 30 keV was investigated and successfully removed the 50 nm nickel absorber film. TEM imaging also revealed subsurface damage in the underlying Mo-Si multilayer. Two damage regimes were apparent, namely: 1) beam induced mixing of the Mo-Si layers and 2) nanobubble formation. Monte Carlo simulations were performed and the observed damage regimes were correlated to: 1) the nuclear energy loss and 2) a critical implant concentration. Electron beam induced deposition (EBID) was explored to deposit ruthenium capping/protective layers. Several ruthenium precursors were screened and so far liquid bis(ethylcyclopentyldienyl)ruthenium(II) was successful. The purity of the as-deposited nanodeposits was estimated to be 10% Ru and 90% C. We demonstrate a new chemically assisted electron beam purification process to remove carbon by-products and show that high-fidelity nanoscale ruthenium repairs can be realized.

  11. Thermal behaviour of helium-implanted spinel single crystals

    NASA Astrophysics Data System (ADS)

    Velisa, G.; Debelle, A.; Vincent, L.; Thomé, L.; Declémy, A.; Pantelica, D.; Antohe, S.

    2011-09-01

    The study of the microstructural modifications induced in spinel implanted with 4He + at 4.7 at.% and subsequently annealed at 1075 K is addressed in this paper. The combination of three analysis techniques Rutherford backscattering spectrometry in channeling geometry (RBS/C), X-ray diffraction and transmission electron microscopy was used in order to gain information about the damage depth distribution, the nature of radiation defects, and the occurrence of microstructural modifications. In as-implanted crystals the disorder level is weak, and the damage principally consists of small helium-vacancy clusters. These defects induce a tensile strain in the direction normal to the implanted crystal surface. After annealing, a surprising increase of the disorder level is measured by RBS/C. This increased backscattering yield is due to the formation of a particular type of He-vacancy clusters, namely He platelets, which also induce a relaxation of the strain.

  12. Helium ion implantation in zirconium: Bubble formation and growth

    NASA Astrophysics Data System (ADS)

    Totemeier, Aaron Robert

    To evaluate the behavior of inert helium gas bubbles in zirconium three variants of the metal were implanted with 140 keV helium ions to a total fluence of 3x1017 cm--2 and characterized in cross-section TEM in their as-implanted state as well as during annealing at different temperatures. The three zirconium alloys included high-purity crystal bar material, Zircaloy-4, and a powder-metallurgically extruded material with high carbon and oxygen concentrations. At a sample depth consistent with a helium concentration of approximately 5 atomic percent, a change in the structure of the zirconium was observed a high density region of small (4nm diameter) bubbles formed at concentrations above 10 atom percent. Initial bubble formation and growth was observed to occurred at a temperature between 400-450 °C and these initial bubbles had a unique planar geometry prior to migration and coalescence into more three-dimensional bubbles. These planar bubbles appear to be aligned with major axes parallel to the TEM specimen surface and their formation and growth is possibly due to an increase in the thermal vacancy flux within the zirconium. The observations of bubble response to high temperature annealing suggest that in zirconium, as in other metals, maximum bubble size is weakly dependent on annealing time, whereas the bubble size distribution is strongly dependent on time. Specimens that underwent a prolonged room temperature aging developed a multimodal bubble size distribution within the high density region of small bubbles, concentrated near the highest helium concentration depth.

  13. Effects of sequential tungsten and helium ion implantation on nano-indentation hardness of tungsten

    SciTech Connect

    Armstrong, D. E. J.; Edmondson, P. D.; Roberts, S. G.

    2013-06-24

    To simulate neutron and helium damage in a fusion reactor first wall sequential self-ion implantation up to 13 dpa followed by helium-ion implantation up to 3000 appm was performed to produce damaged layers of {approx}2 {mu}m depth in pure tungsten. The hardness of these layers was measured using nanoindentation and was studied using transmission electron microscopy. Substantial hardness increases were seen in helium implanted regions, with smaller hardness increases in regions which had already been self-ion implanted, thus, containing pre-existing dislocation loops. This suggests that, for the same helium content, helium trapped in distributed vacancies gives stronger hardening than helium trapped in vacancies condensed into dislocation loops.

  14. Helium reemission, desorption and microstructure evolution of graphites under helium ion implantation

    NASA Astrophysics Data System (ADS)

    Alimov, V. Kh.; Scherzer, B. M. U.; Chernikov, V. N.; Ullmaier, H.

    1995-07-01

    Helium reemission, trapping, and thermal desorption from highly ordered pyrolytic graphite (HOPG and HPG) of different orientation, polycrystalline graphite (EK98), and titanium doped graphite (RG-Ti-91) have been measured at irradiation temperatures of 300 K and 800 K. The implantation was performed with a 40 keV 4He ion beam. Detailed transmission electron microscopy (TEM) investigation of the microstructure evolution was made on the implanted specimens. He reemission from basal oriented (BO) highly oriented pyrolytic graphite is accompanied by blistering and flaking leading to repetitive gas bursts. On edge oriented (EO) pyrolytic graphite three reemission peaks are observed during room temperature implantation, the first and smallest one being assigned to He release from intrinsic lenticular cavities, the second one occurs during early bubble formation when a small amount of implanted gas still escapes accumulation, and the third and largest peak being due to He release by bubble coalescence. The He reemission rate grows very slowly at room temperature and does not reach 100% up to the highest implanted fluence of 3.5ṡ1018 He/cm2. At 800 K the He reemission rate from EO pyrolytic graphite reaches 100% immediately after starting implantation due to the high diffusive mobility of He. EK98 and RG-Ti-91 show similar reemission behaviour. No gas bursts due to blistering are observed. The initial reemission rate at 300 K is higher than in EO pyrolytic graphite due to release of He via a network of intergranular channels. At 800 K reemission is rather similar to that from EO pyrolytic graphite. No thermal desorption of He from BO HOPG up to 1200 K is observed for implanted fluences ≤1016 He/cm2. At higher fluences the onset temperature of desorption decreases from 750 K at 2ṡ1016 He/cm2 to 380 K at 1017 He/cm2 caused by thermal flaking due to pressure increase of He in submicroscopic cracks. In the other materials two desorption peaks are observed, the first one

  15. Growth of interleaved masking patterns for cochlear implant listeners at different stimulation rates

    NASA Astrophysics Data System (ADS)

    Kwon, Bom Jun; van den Honert, Chris; Parkinson, Wendy

    2003-04-01

    This study investigates the pattern of growth of masking (GOM) for interleaved masking with Nucleus cochlear implant users. For an interleaved masking paradigm, where the masker and probe overlap in a same time window, the masker may have contrasting effects: it may increase the threshold (as a masker normally does) or decrease it due to a neural summation effect, facilitating detection of the probe. Several stimulation rates and masker levels were tested to examine under what conditions what phenomenon would occur. The results indicated that, in most of the conditions, the amount of masking was positive, i.e., the facilitating effect was not consistently observed. However, the slope of the GOM appears to be dependent upon the stimulation rate: the higher the stimulation rate, the lower the slope, implying that the facilitating effect might be always present and make a bigger impact on overall masking as the stimulation rate becomes high. The amount of masking was also often nonzero (positive) even when the masker was below the threshold level. Overall, the present findings indicate that interleaved masking should be handled with care to understand cochlear implant users speech perception and improve speech coding, as it contains some nontraditional aspects of masking.

  16. Place specificity of monopolar and tripolar stimuli in cochlear implants: the influence of residual masking.

    PubMed

    Fielden, Claire A; Kluk, Karolina; McKay, Colette M

    2013-06-01

    This experiment investigated whether place specificity of neural activity evoked by cochlear implant stimulation is improved in tripolar compared to monopolar mode using a forward masking protocol addressing some limitations of previous methods of measurement and analysis. The amount of residual masking (masking remaining at long masker-probe delays) was also measured, and its potential influence on the specificity measures was evaluated. The masker stimulus comprised equally loud interleaved mono- or tripolar stimulation on two electrodes equidistant from a central probe electrode in an apical and basal direction, reducing the influence of off-site listening. The effect of masker-probe distance on the threshold shift of the tripolar probe was analyzed to derive a measure of place specificity. On average, tripolar maskers were more place specific than monopolar maskers, although the mean effect was small. There was no significant effect of masker level on specificity or on the differences observed between modes. The mean influence of residual masking on normalized masking functions was similar for the two modes and, therefore, did not influence the comparison of specificity between the modes. However, variability in amount of residual masking was observed between subjects, and therefore should be considered in forward masking studies that compare place specificity across subjects. PMID:23742363

  17. The role of helium implantation induced vacancy defect on hardening of tungsten

    SciTech Connect

    Ou, Xin; Anwand, Wolfgang Kögler, Reinhard; Zhou, Hong-Bo; Richter, Asta

    2014-03-28

    Vacancy-type defects created by helium implantation in tungsten and their impact on the nano-hardness characteristics were investigated by correlating the results from the positron annihilation spectroscopy and the nano-indentation technique. Helium implantation was performed at room temperature (RT) and at an elevated temperate of 600 °C. Also, the effect of post-annealing of the RT implanted sample was studied. The S parameter characterizing the open volume in the material was found to increase after helium irradiation and is significantly enhanced for the samples thermally treated at 600 °C either by irradiation at high temperature or by post-annealing. Two types of helium-vacancy defects were detected after helium irradiation; small defects with high helium-to-vacancy ratio (low S parameter) for RT irradiation and large defects with low helium-to-vacancy ratio (high S parameter) for thermally treated tungsten. The hardness of the heat treated tungsten coincides with the S parameter, and hence is controlled by the large helium-vacancy defects. The hardness of tungsten irradiated at RT without thermal treatment is dominated by manufacturing related defects such as dislocation loops and impurity clusters and additionally by trapped He atoms from irradiation effects, which enhance hardness. He-stabilized dislocation loops mainly cause the very high hardness values in RT irradiated samples without post-annealing.

  18. Low energy and low fluence helium implantations in tungsten: Molecular dynamics simulations and experiments

    NASA Astrophysics Data System (ADS)

    Pentecoste, L.; Brault, P.; Thomann, A.-L.; Desgardin, P.; Lecas, T.; Belhabib, T.; Barthe, M.-F.; Sauvage, T.

    2016-03-01

    300 eV Helium implantation process into tungsten at 300 K has been studied with molecular dynamic simulations (MD). Predicted retention doses were compared to that obtained from experiments performed in equivalent conditions. A saturation phenomenon of the helium retention was evidenced for a number of impinging He atoms and a retention dose similar in both, experiments and simulations. From MD simulations it is learnt that observed Helium diffusion, formation and coalescence of clusters are the phenomena leading to the flaking of the substrate. These processes could explain the saturation of the Helium retention observed experimentally at low energies.

  19. Structural investigations in helium implanted cubic zirconia using grazing incidence XRD and EXAFS spectroscopy

    NASA Astrophysics Data System (ADS)

    Kuri, G.; Degueldre, C.; Bertsch, J.; Döbeli, M.

    2010-06-01

    The crystal structure and local atom arrangements surrounding Zr atoms were determined for a helium implanted cubic stabilized zirconia (CSZ) using X-ray diffraction (XRD) and extended X-ray absorption fine structure (EXAFS) spectroscopy, respectively, measured at glancing angles. The implanted specimen was prepared at a helium fluence of 2 × 10 16 cm -2 using He + beams at two energies (2.54 and 2.74 MeV) passing through a 8.0 μm Al absorber foil. XRD results identified the formation of a new rhombohedral phase in the helium embedded layer, attributed to internal stress as a result of expansion of the CSZ-lattice. Zr K-edge EXAFS data suggested loss of crystallinity in the implanted lattice and disorder of the Zr atoms environment. EXAFS Fourier transforms analysis showed that the average first-shell radius of the Zr sbnd O pair in the implanted sample was slightly larger than that of the CSZ standard. Common general disorder features were explained by rhombohedral type short-range ordered clusters. The average structural parameters estimated from the EXAFS data of unimplanted and implanted CSZ are compared and discussed. Potential of EXAFS as a local probe of atomic-scale structural modifications induced by helium implantation in CSZ is demonstrated.

  20. Structure and micro-mechanical properties of helium-implanted layer on Ti by plasma-based ion implantation

    NASA Astrophysics Data System (ADS)

    Ma, Xinxin; Li, Jinlong; Sun, Mingren

    2008-08-01

    The present paper concentrates on structure and micro-mechanical properties of the helium-implanted layer on titanium treated by plasma-based ion implantation with a pulsed voltage of -30 kV and doses of 3, 6, 9 and 12 × 10 17 ions/cm 2, respectively. X-ray photoelectron spectroscopy and transmission electron microscopy are employed to characterize the structure of the implanted layer. The hardnesses at different depths of the layer were measured by nano-indentation. We found that helium ion implantation into titanium leads to the formation of bubbles with a diameter from a few to more than 10 nm and the bubble size increases with the increase of dose. The primary existing form of Ti is amorphous in the implanted layer. Helium implantation also enhances the ingress of O, C and N and stimulates the formations of TiO 2, Ti 2O 3, TiO, TiC and TiN in the near surface layer. And the amount of the ingressed oxygen is obviously higher than those of nitrogen and carbon due to its higher activity. At the near surface layer, the hardnesses of all implanted samples increases remarkably comparing with untreated one and the maximum hardness has an increase by a factor of up to 3.7. For the samples implanted with higher doses of 6, 9 and 12 × 10 17 He/cm 2, the local displacement bursts are clearly found in the load-displacement curves. For the samples implanted with a lower dose of 3 × 10 17 He/cm 2, there is no obvious displacement burst found. Furthermore, the burst width increases with the increase of the dose.

  1. The effects of swift heavy-ion irradiation on helium-ion-implanted silicon

    NASA Astrophysics Data System (ADS)

    Li, B. S.; Du, Y. Y.; Wang, Z. G.; Shen, T. L.; Li, Y. F.; Yao, C. F.; Sun, J. R.; Cui, M. H.; Wei, K. F.; Zhang, H. P.; Shen, Y. B.; Zhu, Y. B.; Pang, L. L.

    2014-10-01

    Cross-sectional transmission electron microscopy (XTEM) was used to study the effects of irradiation with swift heavy ions on helium-implanted silicon. <1 0 0>-oriented silicon wafers were implanted with 30 keV helium to a dose of 3 × 1016 He+/cm2 at 600 K. Subsequently, the helium-implanted Si wafers were irradiated with 792 MeV argon ions. The He bubbles and extended defects in the wafers were examined via XTEM analysis. The results reveal that the mean diameter of the He bubbles increases upon Ar-ion irradiation, while the number density of the He bubbles decreases. The microstructure of the He bubbles observed after Ar-ion irradiation is comparable to that observed after annealing at 1073 K for 30 min. Similarly, the mean size of the extended defects, i.e., Frank loops, increases after Ar-ion irradiation. Possible mechanisms are discussed.

  2. Helium-neon laser therapy in the treatment of hydroxyapatite orbital implant exposure: A superior option

    PubMed Central

    XU, QI-HUA; ZHAO, CHEN; ZHU, JIAN-GANG; CHEN, MEI-JUAN; LIU, QING-HUAI

    2015-01-01

    The aim of the present study was to evaluate the efficacy of helium-neon laser therapy in the treatment of hydroxyapatite orbital implant exposure and compare the results with those of a combined drugs and surgery regimen. A total of 70 patients with hydroxyapatite orbital implant exposure in 70 eyes were randomly divided into two groups: Helium-neon laser therapy (group A) and drugs plus surgery (group B). Each group contained 35 patients. The healing rates and times of the conjunctival wound were recorded and compared following helium-neon laser treatment or the drugs plus surgery regimen. Changes in the hydroxyapatite orbital implant prior to and following helium-neon laser irradiation were analyzed. A similar animal study was conducted using 24 New Zealand white rabbits, which received orbital implants and were then received drug treatment or helium-neon therapy. In the human experiment, the rates for conjunctival wound healing were 97.14% in group A and 74.29% in group B, with a significant difference between the groups (χ2=5.71, P<0.05). Patients with mild exposure were healed after 7.22±2.11 days of helium-neon laser therapy and 14.33±3.20 days of drugs plus surgery. A statistically significant difference was found between the groups (t=8.97, P<0.05). Patients with moderate to severe exposure were healed after 18.19±2.12 days of helium-neon laser therapy and 31.25±4.21 days of drugs plus surgery. The difference between the groups was statistically significant (t=7.91, P<0.05). Enhanced magnetic resonance imaging showed that the helium-neon laser therapy significantly promoted vascularization of the hydroxyapatite orbital implant. These results, combined with pathological findings in animals, which showed that a helium-neon laser promoted vascularization and had anti-inflammatory effects, suggest that helium-neon laser irradiation is an effective method for treating hydroxyapatite orbital implant exposure, thereby avoiding secondary surgery. PMID

  3. Microstructure characterization and optical properties of sapphire after helium ion implantation

    NASA Astrophysics Data System (ADS)

    Zhong, Mian; Yang, Liang; Shen, Huahai; Liu, Wei; Xiang, Xia; Zheng, Wanguo; Guo, Decheng; Huang, Jin; Sun, Kai; Yuan, Xiaodong

    2015-06-01

    The (0 0 0 1) sapphire samples are irradiated with 60 keV helium ions at the fluences of 5 × 1016, 1 × 1017and 5 × 1017 ions/cm2 at room temperature. After implantation, two broad absorption bands at 320-460 and 480-700 nm are observed and their intensities increase with the increasing ion fluence. The grazing incidence X-ray diffraction results indicate that the {0 0 0 1} diffraction peaks of sapphire decrease and broaden due to the disorientation of the generated crystallites after ion irradiation. The microstructure evolution is examined by the scanning and transmission electron microscopes. The surface becomes rough because of the aggregation of helium bubbles and migration towards the surface. There is a lattice expansion up to ∼4.5% in the implanted area and the lattice distortion measured from dispersion of (1 1 0) diffraction is ∼4.6°. Such strain of crystal lattice is rather large and leads to contrast fluctuation at scale of 1-2 nm (the bubble size). The laser induced damage threshold (LIDT) is investigated to understand the effect of helium ion beam irradiation on the laser damage resistance of sapphire components and the results show that the LIDT decreases from 5.4 to 2.5 J/cm2 due to the absorptive color centers, helium bubbles and defects induced by helium ion implantation. The laser damage morphologies of samples before and after ion implantation are also presented.

  4. Lattice location and annealing behaviour of helium atoms implanted in uranium dioxide single crystals

    NASA Astrophysics Data System (ADS)

    Belhabib, T.; Desgardin, P.; Sauvage, T.; Erramli, H.; Barthe, M. F.; Garrido, F.; Carlot, G.; Nowicki, L.; Garcia, P.

    2015-12-01

    Helium behaviour in irradiated uranium dioxide may play an important role in the mechanical stability of nuclear fuels during and after its use in nuclear power plants. Helium migration mechanisms in bulk UO2 have already been the subject of theoretical studies but there is a lack of experimental data relating to the most stable location in the crystal. To this end, we have studied uranium dioxide samples implanted with helium ions at low fluence before and after thermal annealing in the range 600 and 800 °C. UO2 single crystals were implanted with 50 keV-3He ions at the fluence of 1 × 1015 at cm-2 and the location in the lattice of helium atoms was investigated using NRA (Nuclear Reaction Analysis) based on the reaction of 3He with deuterons (3He (d,p) 4He) in a channelling mode, recording angular scans across axes and planes. Furthermore, the uranium sub-lattice was analysed by the classical RBS method. After implantation, the experimental angular scans recorded across the main crystallographic axes and along major planes show that the helium atoms in their large majority occupy octahedral interstitial sites. No modification of the occupied crystallographic site was found after annealing at 600 °C. Conversely, no crystallographic relationship between matrix and helium signals was revealed following annealing at 800 °C. The latter feature is likely related to the clustering of implanted helium atoms into gas-filled bubbles. These experimental results have been quantified and interpreted using Monte Carlo simulations with the McChasy code.

  5. Characterization of Surface Composition and Microstructure of H13 Steel Implanted by ti Ions Using Masking Implantation Procedure

    NASA Astrophysics Data System (ADS)

    Yang, J. H.; Li, S.; Cheng, M. F.; Luo, X. D.

    Ti and C ions extracted from a metal vapor vacuum arc ion source (MEVVA) were implanted into H13 steel using a masking procedure to ensure reproducible conditions for testing and subsequent analysis. An optical interference microscope and pin-on-disc apparatus investigated the wear and friction characteristics of the steel. The Ti concentration depth profile from Rutherford backscattering spectroscopy was compared with that calculated by a TRIDYN code. It was observed by grazing-angle X-ray diffraction and transmission electron microscopy that carbide of Ti appeared in the doped region. The concentration depth profile and microstructure analysis can serve to illuminate the wear resistance improvement mechanisms of the Ti-implanted steel.

  6. Irradiation-induced microstructural change in helium-implanted single crystal and nano-engineered SiC

    NASA Astrophysics Data System (ADS)

    Chen, C. H.; Zhang, Y.; Fu, E.; Wang, Y.; Crespillo, M. L.; Liu, C.; Shannon, S.; Weber, W. J.

    2014-10-01

    Microstructural evolution induced by helium implantation and subsequent heavy ion irradiation has been investigated in single crystal and nano-engineered (NE) 3C SiC. Implantation with 65 keV He+ ions was performed at 277 °C, and the helium depth distribution was determined by elastic recoil detection analysis (ERDA). Transmission electron microscopy (TEM) could not resolve the presence of bubbles in any of the helium-implanted single crystal SiC. However, helium platelets and small dislocation loops (∼50 nm in diameter) were observed in the single crystal sample with the highest implantation fluence after 1 h annealing at 700 °C. Following irradiation with 9 MeV Au3+ ions at 700 °C, no bubbles were observed in the helium-implanted single crystal SiC, regardless of helium fluence. For the helium-implanted NE SiC, subsequent irradiation with 9 MeV Au ions to a dose of 10 dpa at 700 °C resulted in the formation and growth of bubbles, and a bimodal helium bubble size distribution was observed at the highest helium concentration (8000 appm) in the NE SiC.

  7. Blistering and cracking of LiTaO3 single crystal under helium ion implantation

    NASA Astrophysics Data System (ADS)

    Ma, Changdong; Lu, Fei; Ma, Yujie

    2015-03-01

    Blistering and cracking in LiTaO3 surface are investigated after 200-keV helium ion implantation and subsequent post-implantation annealing. Rutherford backscattering/channeling is used to examine the lattice damage caused by ion implantation. Blistering is observed through optical microscopy in a dynamic heating process. Atomic force microscopy and scanning electron microscopy measurements are used to detect the LiTaO3 surface morphology. Experimental results show that blistering and flaking are dependent on implantation fluence, beam current, and also annealing temperature. We speculate that the surface cracking of He+-implanted LiTaO3 results from the implantation-induced stress and compression.

  8. Low flux and low energy helium ion implantation into tungsten using a dedicated plasma source

    NASA Astrophysics Data System (ADS)

    Pentecoste, Lucile; Thomann, Anne-Lise; Melhem, Amer; Caillard, Amael; Cuynet, Stéphane; Lecas, Thomas; Brault, Pascal; Desgardin, Pierre; Barthe, Marie-France

    2016-09-01

    The aim of this work is to investigate the first stages of defect formation in tungsten (W) due to the accumulation of helium (He) atoms inside the crystal lattice. To reach the required implantation conditions, i.e. low He ion fluxes (1011-1014 ions.cm2.s-1) and kinetic energies below the W atom displacement threshold (about 500 eV for He+), an ICP source has been designed and connected to a diffusion chamber. Implantation conditions have been characterized by means of complementary diagnostics modified for measurements in this very low density helium plasma. It was shown that lowest ion fluxes could only be reached for the discharge working in capacitive mode either in α or γ regime. Special attention was paid to control the energy gained by the ions by acceleration through the sheath at the direct current biased substrate. At very low helium pressure, in α regime, a broad ion energy distribution function was evidenced, whereas a peak centered on the potential difference between the plasma and the biased substrate was found at higher pressures in the γ mode. Polycrystalline tungsten samples were exposed to the helium plasma in both regimes of the discharge and characterized by positron annihilation spectroscopy in order to detect the formed vacancy defects. It was found that W vacancies are able to be formed just by helium accumulation and that the same final implanted state is reached, whatever the operating mode of the capacitive discharge.

  9. Microstructure of a 14Cr-ODS ferritic steel before and after helium ion implantation

    NASA Astrophysics Data System (ADS)

    Lu, Chenyang; Lu, Zheng; Xie, Rui; Liu, Chunming; Wang, Lumin

    2014-12-01

    A 14Cr-ODS ferritic steel with the nominal compositions of Fe-14Cr-2 W-0.3Ti-0.3Y2O3 (wt.%) was produced by mechanical alloying (MA) and hot isostatic pressing (HIP). Helium ion was implanted into the 14Cr-ODS steel along with Eurofer 97 steel as reference at 400 °C to a fluence of 1 × 1017 He+/cm2. High resolution transmission electron microscopy (HRTEM), high angle annual dark field (HAADF) scanning TEM (STEM) and atom probe tomography (APT) were used to characterize the microstructure of 14Cr-ODS and Eurofer 97 steels before and after helium implantation. High-density Y-Ti-O-rich nanoclusters and Y2Ti2O7 precipitates as well as large Cr-Ti rich oxides were observed in the 14Cr-ODS steel. The average size of Y-Ti-O nanoclusters and Y2Ti2O7 precipitates is 9 nm. After helium implantation, the helium bubbles formed in the 14Cr-ODS steel exhibit the smaller size and the lower volume fraction than that in Eurofer 97 steel, indicating high-density nano-scale precipitates can effectively suppress the coarsening of helium bubbles.

  10. Study of the amorphization of surface silicon layers implanted by low-energy helium ions

    NASA Astrophysics Data System (ADS)

    Lomov, A. A.; Myakon'kikh, A. V.; Oreshko, A. P.; Shemukhin, A. A.

    2016-03-01

    The structural changes in surface layers of Si(001) substrates subjected to plasma-immersion implantation by (2-5)-keV helium ions to a dose of D = 6 × 1015-5 × 1017 cm-2 have been studied by highresolution X-ray diffraction, Rutherford backscattering, and spectral ellipsometry. It is found that the joint application of these methods makes it possible to determine the density depth distribution ρ( z) in an implanted layer, its phase state, and elemental composition. Treatment of silicon substrates in helium plasma to doses of 6 × 1016 cm-2 leads to the formation of a 20- to 30-nm-thick amorphized surface layer with a density close to the silicon density. An increase in the helium dose causes the formation of an internal porous layer.

  11. Effects of helium implantation on the tensile properties and microstructure of Ni₇₃P₂₇ metallic glass nanostructures

    DOE PAGESBeta

    Liontas, Rachel; Gu, X. Wendy; Fu, Engang; Wang, Yongqiang; Li, Nan; Mara, Nathan; Greer, Julia R.

    2014-09-10

    We report fabrication and nanomechanical tension experiments on as-fabricated and helium-implanted ~130 nm diameter Ni₇₃P₂₇ metallic glass nano-cylinders. The nano-cylinders were fabricated by a templated electroplating process and implanted with He⁺ at energies of 50, 100, 150, and 200 keV to create a uniform helium concentration of ~3 at. % throughout the nano-cylinders. Transmission electron microscopy (TEM) imaging and through-focus analysis reveal that the specimens contained ~2 nm helium bubbles distributed uniformly throughout the nano-cylinder volume. In-situ tensile experiments indicate that helium-implanted specimens exhibit enhanced ductility as evidenced by a 2-fold increase in plastic strain over as-fabricated specimens, with nomore » sacrifice in yield and ultimate tensile strengths. This improvement in mechanical properties suggests that metallic glasses may actually exhibit a favorable response to high levels of helium implantation.« less

  12. Effects of helium implantation on the tensile properties and microstructure of Ni₇₃P₂₇ metallic glass nanostructures

    SciTech Connect

    Liontas, Rachel; Gu, X. Wendy; Fu, Engang; Wang, Yongqiang; Li, Nan; Mara, Nathan; Greer, Julia R.

    2014-09-10

    We report fabrication and nanomechanical tension experiments on as-fabricated and helium-implanted ~130 nm diameter Ni₇₃P₂₇ metallic glass nano-cylinders. The nano-cylinders were fabricated by a templated electroplating process and implanted with He⁺ at energies of 50, 100, 150, and 200 keV to create a uniform helium concentration of ~3 at. % throughout the nano-cylinders. Transmission electron microscopy (TEM) imaging and through-focus analysis reveal that the specimens contained ~2 nm helium bubbles distributed uniformly throughout the nano-cylinder volume. In-situ tensile experiments indicate that helium-implanted specimens exhibit enhanced ductility as evidenced by a 2-fold increase in plastic strain over as-fabricated specimens, with no sacrifice in yield and ultimate tensile strengths. This improvement in mechanical properties suggests that metallic glasses may actually exhibit a favorable response to high levels of helium implantation.

  13. Effects of helium implantation on the tensile properties and microstructure of Ni73P27 metallic glass nanostructures.

    PubMed

    Liontas, Rachel; Gu, X Wendy; Fu, Engang; Wang, Yongqiang; Li, Nan; Mara, Nathan; Greer, Julia R

    2014-09-10

    We report fabrication and nanomechanical tension experiments on as-fabricated and helium-implanted ∼130 nm diameter Ni73P27 metallic glass nanocylinders. The nanocylinders were fabricated by a templated electroplating process and implanted with He(+) at energies of 50, 100, 150, and 200 keV to create a uniform helium concentration of ∼3 atom % throughout the nanocylinders. Transmission electron microscopy imaging and through-focus analysis reveal that the specimens contained ∼2 nm helium bubbles distributed uniformly throughout the nanocylinder volume. In situ tensile experiments indicate that helium-implanted specimens exhibit enhanced ductility as evidenced by a 2-fold increase in plastic strain over as-fabricated specimens with no sacrifice in yield and ultimate tensile strengths. This improvement in mechanical properties suggests that metallic glasses may actually exhibit a favorable response to high levels of helium implantation. PMID:25084487

  14. In situ creep under helium implantation of titanium aluminium alloy

    NASA Astrophysics Data System (ADS)

    Chen, J.; Jung, P.; Nazmy, M.; Hoffelner, W.

    2006-06-01

    The intermetallic alloy Ti-47Al-2W-0.5Si (at.%) has been homogeneously implanted with 4He2+ ions under uniaxial tensile stresses from 20 to 450 MPa to a maximum dose of about 0.16 dpa (1370 appm-He) with displacement damage rates of 2 × 10-6 dpa s-1 at temperatures of 573 and 773 K. Strain under implantation was determined by Linear Variable Displacement Transformer (LVDT), while changes of microstructure were investigated after implantation by Transmission Electron Microscopy (TEM). Irradiation creep strain showed a pronounced transient behaviour, virtually independent of temperature, with a stress dependence which can be approximately described by a creep compliance of 8 × 10-6 dpa-1 MPa-1 up to stresses of 350 MPa. The microstructure of the as-received material consisted of a patch-work of mainly lamellar γ/α2 colonies and equiaxed γ-grains with islands of precipitates. Only 'black dot' damage was observed after implantation at 573 K under different stresses, while implantation at 773 K yielded a dense population of bubbles and dislocation loops, mostly mutually attached.

  15. Speech understanding performance of cochlear implant subjects using time-frequency masking-based noise reduction.

    PubMed

    Qazi, Obaid ur Rehman; van Dijk, Bas; Moonen, Marc; Wouters, Jan

    2012-05-01

    Cochlear implant (CI) recipients report severe degradation of speech understanding under noisy conditions. Most CI recipients typically can require about 10-25 dB higher signal-to-noise ratio than normal hearing (NH) listeners in order to achieve similar speech understanding performance. In recent years, significant emphasis has been put on binaural algorithms, which not only make use of the head shadow effect, but also have two or more microphone signals at their disposal to generate binaural inputs. Most of the CI recipients today are unilaterally implanted but they can still benefit from the binaural processing utilizing a contralateral microphone. The phase error filtering (PEF) algorithm tries to minimize the phase error variance utilizing a time-frequency mask for noise reduction. Potential improvement in speech intelligibility offered by the algorithm is evaluated with four different kinds of mask functions. The study reveals that the PEF algorithm which uses a contralateral microphone but unilateral presentation provides considerable improvement in intelligibility for both NH and CI subjects. Further, preference rating test suggests that CI subjects can tolerate higher levels of distortions than NH subjects, and therefore, more aggressive noise reduction for CI recipients is possible. PMID:22345522

  16. Spatial Release From Masking in Simulated Cochlear Implant Users With and Without Access to Low-Frequency Acoustic Hearing

    PubMed Central

    Dietz, Mathias; Hohmann, Volker; Jürgens, Tim

    2015-01-01

    For normal-hearing listeners, speech intelligibility improves if speech and noise are spatially separated. While this spatial release from masking has already been quantified in normal-hearing listeners in many studies, it is less clear how spatial release from masking changes in cochlear implant listeners with and without access to low-frequency acoustic hearing. Spatial release from masking depends on differences in access to speech cues due to hearing status and hearing device. To investigate the influence of these factors on speech intelligibility, the present study measured speech reception thresholds in spatially separated speech and noise for 10 different listener types. A vocoder was used to simulate cochlear implant processing and low-frequency filtering was used to simulate residual low-frequency hearing. These forms of processing were combined to simulate cochlear implant listening, listening based on low-frequency residual hearing, and combinations thereof. Simulated cochlear implant users with additional low-frequency acoustic hearing showed better speech intelligibility in noise than simulated cochlear implant users without acoustic hearing and had access to more spatial speech cues (e.g., higher binaural squelch). Cochlear implant listener types showed higher spatial release from masking with bilateral access to low-frequency acoustic hearing than without. A binaural speech intelligibility model with normal binaural processing showed overall good agreement with measured speech reception thresholds, spatial release from masking, and spatial speech cues. This indicates that differences in speech cues available to listener types are sufficient to explain the changes of spatial release from masking across these simulated listener types. PMID:26721918

  17. Spatial Release From Masking in Simulated Cochlear Implant Users With and Without Access to Low-Frequency Acoustic Hearing.

    PubMed

    Williges, Ben; Dietz, Mathias; Hohmann, Volker; Jürgens, Tim

    2015-01-01

    For normal-hearing listeners, speech intelligibility improves if speech and noise are spatially separated. While this spatial release from masking has already been quantified in normal-hearing listeners in many studies, it is less clear how spatial release from masking changes in cochlear implant listeners with and without access to low-frequency acoustic hearing. Spatial release from masking depends on differences in access to speech cues due to hearing status and hearing device. To investigate the influence of these factors on speech intelligibility, the present study measured speech reception thresholds in spatially separated speech and noise for 10 different listener types. A vocoder was used to simulate cochlear implant processing and low-frequency filtering was used to simulate residual low-frequency hearing. These forms of processing were combined to simulate cochlear implant listening, listening based on low-frequency residual hearing, and combinations thereof. Simulated cochlear implant users with additional low-frequency acoustic hearing showed better speech intelligibility in noise than simulated cochlear implant users without acoustic hearing and had access to more spatial speech cues (e.g., higher binaural squelch). Cochlear implant listener types showed higher spatial release from masking with bilateral access to low-frequency acoustic hearing than without. A binaural speech intelligibility model with normal binaural processing showed overall good agreement with measured speech reception thresholds, spatial release from masking, and spatial speech cues. This indicates that differences in speech cues available to listener types are sufficient to explain the changes of spatial release from masking across these simulated listener types. PMID:26721918

  18. Clinical evaluation of cochlear implant sound coding taking into account conjectural masking functions, MP3000™

    PubMed Central

    Buechner, Andreas; Beynon, Andy; Szyfter, Witold; Niemczyk, Kazimierz; Hoppe, Ulrich; Hey, Matthias; Brokx, Jan; Eyles, Julie; Van de Heyning, Paul; Paludetti, Gaetano; Zarowski, Andrzej; Quaranta, Nicola; Wesarg, Thomas; Festen, Joost; Olze, Heidi; Dhooge, Ingeborg; Müller-Deile, Joachim; Ramos, Angel; Roman, Stephane; Piron, Jean-Pierre; Cuda, Domenico; Burdo, Sandro; Grolman, Wilko; Vaillard, Samantha Roux; Huarte, Alicia; Frachet, Bruno; Morera, Constantine; Garcia-Ibáñez, Luis; Abels, Daniel; Walger, Martin; Müller-Mazotta, Jochen; Leone, Carlo Antonio; Meyer, Bernard; Dillier, Norbert; Steffens, Thomas; Gentine, André; Mazzoli, Manuela; Rypkema, Gerben; Killian, Matthijs; Smoorenburg, Guido

    2011-01-01

    Efficacy of the SPEAK and ACE coding strategies was compared with that of a new strategy, MP3000™, by 37 European implant centers including 221 subjects. The SPEAK and ACE strategies are based on selection of 8–10 spectral components with the highest levels, while MP3000 is based on the selection of only 4–6 components, with the highest levels relative to an estimate of the spread of masking. The pulse rate per component was fixed. No significant difference was found for the speech scores and for coding preference between the SPEAK/ACE and MP3000 strategies. Battery life was 24% longer for the MP3000 strategy. With MP3000 the best results were found for a selection of six components. In addition, the best results were found for a masking function with a low-frequency slope of 50 dB/Bark and a high-frequency slope of 37 dB/Bark (50/37) as compared to the other combinations examined of 40/30 and 20/15 dB/Bark. The best results found for the steepest slopes do not seem to agree with current estimates of the spread of masking in electrical stimulation. Future research might reveal if performance with respect to SPEAK/ACE can be enhanced by increasing the number of channels in MP3000 beyond 4–6 and it should shed more light on the optimum steepness of the slopes of the masking functions applied in MP3000. PMID:22251806

  19. Effect of helium implantation on mechanical properties of EUROFER97 evaluated by nanoindentation

    NASA Astrophysics Data System (ADS)

    Roldán, M.; Fernández, P.; Rams, J.; Jiménez-Rey, D.; Ortiz, C. J.; Vila, R.

    2014-05-01

    Helium effects on EUROFER97 mechanical properties were studied by means of nanoindentation. The steel was implanted with He ions in a stair-like profile configuration using energies from 2 to 15 MeV at room temperature. Firstly, a deep nanoindentation study was carried out on as-received state (normalized + tempered) in order to obtain a reliable properties database at the nanometric scale, including aspects such as indentation size effect. The nanoindentation hardness of tests on He implanted samples showed a hardness increase depending on the He concentration. The hardness increase follows the He implantation concentration profile with a good accuracy according to BCA calculations using MARLOWE code, considering the whole volume affected by the nanoindentation tests. The results obtained in this work shown that nanoindentation technique permits to assess any change of hardness properties due to ion implantation.

  20. Helium effects on the post-implantation creep properties and the microstructure of AISI 316L welds and parent material

    NASA Astrophysics Data System (ADS)

    Dai, Yong; Schroeder, Herbert

    1992-09-01

    The influence of implanted helium on the creep properties in electron-beam welds of the Next European Torus (NET) reference material, AISI 316L, and its parent material in the as-received condition has been investigated at 873 K. Helium degredation effects (i.e. reduced creep rupture time and creep rupture strain) are more serious in the parent material than in the welds. The fracture mode for implanted weld specimens is usually transgranular, while for the parent material specimens it is mixed trans- and intergranular. TEM investigations show that in the welds there is a lot of σ-ferrite at grain boundaries (occupying about 50% of grain boundary area) and in the interior of grains as well. Helium bubble sizes increase with increasing helium concentration, while helium bubble densities remain constant. Helium bubbles in the matrix are larger in size but much lower in density than those at boundaries or interfaces.

  1. BCA-kMC Hybrid Simulation for Hydrogen and Helium Implantation in Material under Plasma Irradiation

    NASA Astrophysics Data System (ADS)

    Kato, Shuichi; Ito, Atsushi; Sasao, Mamiko; Nakamura, Hiroaki; Wada, Motoi

    2015-09-01

    Ion implantation by plasma irradiation into materials achieves the very high concentration of impurity. The high concentration of impurity causes the deformation and the destruction of the material. This is the peculiar phenomena in the plasma-material interaction (PMI). The injection process of plasma particles are generally simulated by using the binary collision approximation (BCA) and the molecular dynamics (MD), while the diffusion of implanted atoms have been traditionally solved by the diffusion equation, in which the implanted atoms is replaced by the continuous concentration field. However, the diffusion equation has insufficient accuracy in the case of low concentration, and in the case of local high concentration such as the hydrogen blistering and the helium bubble. The above problem is overcome by kinetic Monte Carlo (kMC) which represents the diffusion of the implanted atoms as jumps on interstitial sites in a material. In this paper, we propose the new approach ``BCA-kMC hybrid simulation'' for the hydrogen and helium implantation under the plasma irradiation.

  2. Irradiation hardening of ODS ferritic steels under helium implantation and heavy-ion irradiation

    NASA Astrophysics Data System (ADS)

    Zhang, Hengqing; Zhang, Chonghong; Yang, Yitao; Meng, Yancheng; Jang, Jinsung; Kimura, Akihiko

    2014-12-01

    Irradiation hardening of ODS ferritic steels after multi-energy He-ion implantation, or after irradiation with energetic heavy ions including Xe and Bi-ions was investigated with nano-indentation technique. Three kinds of high-Cr ODS ferritic steels including the commercial MA956 (19Cr-3.5Al), the 16Cr-0.1Ti and the 16Cr-3.5Al-0.1Zr were used. Data of nano-hardness were analyzed with an approach based on Nix-Gao model. The depth profiles of nano-hardness can be understood by the indentation size effect (ISE) in specimens of MA956 implanted with multi-energy He-ions or irradiated with 328 MeV Xe ions, which produced a plateau damage profile in the near-surface region. However, the damage gradient overlaps the ISE in the specimens irradiated with 9.45 Bi ions. The dose dependence of the nano-hardness shows a rapid increase at low doses and a slowdown at higher doses. An 1/2-power law dependence on dpa level is obtained. The discrepancy in nano-hardness between the helium implantation and Xe-ion irradiation can be understood by using the average damage level instead of the peak dpa level. Helium-implantation to a high dose (7400 appm/0.5 dpa) causes an additional hardening, which is possibly attributed to the impediment of motion dislocations by helium bubbles formed in high concentration in specimens.

  3. Dependence of the tensile properties of 316 L parent material and welds on implanted hydrogen and/or helium

    NASA Astrophysics Data System (ADS)

    Schroeder, Herbert; Liu, Wanpei

    1992-09-01

    The interest in the low temperature tensile properties of candidate alloys for first wall and blanket structures of future fusion devices is due to the possible low pressure water cooling and the associated low operation temperature in recent design studies. Therefore, the tensile properties of hydrogen and/or helium implanted 316 L stainless steel and its weldments as a function of gas concentrations and temperature were investigated. The main effects of the implantation are hardening, resulting in large increases of the yield strength proportional to the implanted gas concentration, and a gradual decrease of the corresponding rupture strain. The ultimate tensile stresses are less affected. The effect of helium implantation seems to be more pronounced than that of hydrogen implantation. At 673 K most of the implantation induced changes are recovered. Generally parent material and welds still show large ductility (≥20%) under all conditions investigated.

  4. Helium effects on microstructural evolution in tempered martensitic steels: In situ helium implanter studies in HFIR

    SciTech Connect

    Yamamoto, Takuya; Odette, George R.; Miao, Pifeng; Edwards, Danny J.; Kurtz, Richard J.

    2009-04-30

    Microstructural evolutions in tempered martensitic steels (TMS) under neutron-irradiation, at fusion relevant He/dpa ratios and dpa rates, were characterized using a novel in situ He-implanter technique. F82H-mod3 was irradiated at 500 C in HFIR to a nominal 9 dpa and 190 or 380 appm He in both in the as-tempered (AT) and 20% cold-worked (CW) conditions. In all cases, a high number density of 1-2 nm He-bubbles were observed, along with fewer but larger 10 nm void-like faceted cavities. The He-bubbles form preferentially on dislocations and various interfaces. A slightly larger number of smaller He bubbles were observed in the CW condition. The lower He/dpa ratio produced slightly smaller and fewer He-bubbles. Comparisons of these observations to the results in nano-structured ferritic alloy (NFA) MA957 provide additional evidence that TMS may be susceptible to He-embrittlement as well as void swelling at fusion relevant He concentrations, while NFA are much more resistant to these degradation phenomena.

  5. Experimental investigations of helium ion implantation in the first wall of JET

    NASA Astrophysics Data System (ADS)

    Zhu, J.; McCracken, G. M.; Coad, J. P.

    1991-07-01

    3.5 MeV alpha particles will be produced in fusion reactors. Although they will be slowed down in the plasma, they will still retain some energy upon diffusing out to the wall and therefore will be expected to become implanted there. We have developed a technique for measuring the depth distribution of helium implanted in metals. The technique has been applied to the analysis of Ni and inconel samples exposed in the JET tokamak for ˜ 5000 discharges during 1987-1988 with ion cyclotron resonance heating (ICRH). Significant quantities of 3He and 4He atoms have been detected due to the use of helium both as a plasma fuel and as a minority species for ICRH. The energy distribution of the ions heated by ICRH in the plasma is expected to be similar to that characterizing the alpha particles in a reactor. The analysis shows a broad range distribution in the samples up to at least 1.0 μm in depth. Calibration of the technique has been performed using implants of monoenergetic 3He and 4He at energies of 2-50 keV and fluences of (1-5) × 10 16 ions cm -2. The results are in quite good agreement with predictions from the TRIM code. The sensitivity of the system is such that concentrations of 5 ×10 18 atoms cm˜3 ( ˜ 50 ppm) are detectable.

  6. Binaural masking level differences in actual and simulated bilateral cochlear implant listeners

    PubMed Central

    Lu, Thomas; Litovsky, Ruth; Zeng, Fan-Gang

    2010-01-01

    At present commercially available bilateral cochlear implants (CIs) improve their users’ speech understanding in noise but they employ two independent speech processors that cannot provide accurate and appropriate interaural level and time differences as seen binaurally in normal hearing (NH) listeners. Previous work suggests that binaural cues are accessible to bilateral CI users when presented to single pairs of pitch-matched electrodes, but the scope was limited and the mechanisms remained unclear. In this study, binaural masking level differences (BMLDs) were measured in five bilateral Nucleus-24 CI users over multiple pairs of pitch-matched electrodes. Average BMLD was 4.6±4.9 dB, but large individual variability prevented significance (p=0.09). Considering just the 125 Hz condition, as in previous work, phase (N0S0 vs N0Sπ) and electrode effects were significant. Compared with simulated bilateral CI users, actual bilateral CI users had proportionally higher thresholds for N0Sπ than N0S0. Together the present results suggest that the performance gap in BMLDs between CI and NH listeners is not due to a lack of sufficient acoustic cues in the temporal envelope domain but to a true binaural deficit related to a central mechanism in deprived binaural processing. PMID:20329848

  7. Helium irradiation effects on retention behavior of deuterium implanted into boron coating film by PCVD

    NASA Astrophysics Data System (ADS)

    Kodama, H.; Oyaidzu, M.; Yoshikawa, A.; Kimura, H.; Oya, Y.; Matsuyama, M.; Sagara, A.; Noda, N.; Okuno, K.

    2005-03-01

    Helium irradiation effects on the retention of energetic deuterium implanted into the boron coating film were investigated by means of X-ray photoelectron spectroscopy (XPS) and thermal desorption spectroscopy (TDS). It was found, by XPS, that the B 1s peak was shifted to lower binding energy side by He + ion irradiation and the FWHM was extended. These facts show that the some defects were introduced into the boron coating film by He + ion irradiation. From TDS experiment, the deuterium retention, especially the amount of B-D terminal bond, increased by the pre-He + ion irradiation. However, it decreased by the post-He + ion irradiation. These experimental results indicate that the B-D terminal bond was mainly influenced by the He + ion irradiation because the two neighbor B-D bonds have to dissociate simultaneously for the B-D-B bridge bond.

  8. Estimated solar wind-implanted helium-3 distribution on the Moon

    USGS Publications Warehouse

    Johnson, J. R.; Swindle, T.D.; Lucey, P.G.

    1999-01-01

    Among the solar wind-implanted volatiles present in the lunar regolith, 3 He is possibly the most valuable resource because of its potential as a fusion fuel. The abundance of 3 He in the lunar regolith at a given location depends on surface maturity, the amount of solar wind fluence, and titanium content, because ilmenite (FeTiO3) retains helium much better than other major lunar minerals. Surface maturity and TiO2 maps from Clementine multispectral data sets are combined here with a solar wind fluence model to produce a 3He abundance map of the Moon. Comparison of the predicted 3He values to landing site observations shows good correlation. The highest 3He abundances occur in the farside maria (due to greater solar wind fluence received) and in higher TiO2 nearside mare regions.

  9. Impurity gettering in silicon using cavities formed by helium implantation and annealing

    DOEpatents

    Myers, S.M. Jr.; Bishop, D.M.; Follstaedt, D.M.

    1998-11-24

    Impurity gettering in silicon wafers is achieved by a new process consisting of helium ion implantation followed by annealing. This treatment creates cavities whose internal surfaces are highly chemically reactive due to the presence of numerous silicon dangling bonds. For two representative transition-metal impurities, copper and nickel, the binding energies at cavities were demonstrated to be larger than the binding energies in precipitates of metal silicide, which constitutes the basis of most current impurity gettering. As a result the residual concentration of such impurities after cavity gettering is smaller by several orders of magnitude than after precipitation gettering. Additionally, cavity gettering is effective regardless of the starting impurity concentration in the wafer, whereas precipitation gettering ceases when the impurity concentration reaches a characteristic solubility determined by the equilibrium phase diagram of the silicon-metal system. The strong cavity gettering was shown to induce dissolution of metal-silicide particles from the opposite side of a wafer. 4 figs.

  10. Impurity gettering in silicon using cavities formed by helium implantation and annealing

    DOEpatents

    Myers, Jr., Samuel M.; Bishop, Dawn M.; Follstaedt, David M.

    1998-01-01

    Impurity gettering in silicon wafers is achieved by a new process consisting of helium ion implantation followed by annealing. This treatment creates cavities whose internal surfaces are highly chemically reactive due to the presence of numerous silicon dangling bonds. For two representative transition-metal impurities, copper and nickel, the binding energies at cavities were demonstrated to be larger than the binding energies in precipitates of metal silicide, which constitutes the basis of most current impurity gettering. As a result the residual concentration of such impurities after cavity gettering is smaller by several orders of magnitude than after precipitation gettering. Additionally, cavity gettering is effective regardless of the starting impurity concentration in the wafer, whereas precipitation gettering ceases when the impurity concentration reaches a characteristic solubility determined by the equilibrium phase diagram of the silicon-metal system. The strong cavity gettering was shown to induce dissolution of metal-silicide particles from the opposite side of a wafer.

  11. Helium and neon implantation and memory observed in a quadrupole mass spectrometer

    NASA Astrophysics Data System (ADS)

    Rau, Ingo; Putzka, Alfred

    1999-07-01

    High accuracy static quadrupole mass spectrometer (QMS) measurement of helium and neon may be impaired by implantation and long lasting thermal desorption effects of the previously trapped atoms. A QMS produces only moderately accelerated ions of 100-200 eV. The ions decelerate at stainless steel surfaces somewhere in the QMS and a part of them will be trapped in surface near sites. For helium and neon most of these trapped atoms are able to desorb with time constants of several hours. This causes an memory effect which hinders high precision measurements. The trapping and desorption experiments reported here indicate that these time constants for the desorption are about 90-477 min for temperatures between 330 and 470 K. 20-60% (330 K) and 450% (470 K) of the atoms which have been trapped desorb subsequently. This could be explained by assuming self-sputtering processes. From the desorption behaviour a binding energy of 1.1 and 1.6 eV for these atoms has been estimated.

  12. Temperature dependence of helium-implantation-induced lattice swelling in polycrystalline tungsten: X-ray micro-diffraction and Eigenstrain modelling

    DOE PAGESBeta

    de Broglie, I.; Beck, C. E.; Liu, W.; Hofmann, Felix

    2015-05-30

    Using synchrotron X-ray micro-diffraction and Eigenstrain analysis the distribution of lattice swelling near grain boundaries in helium-implanted polycrystalline tungsten is quantified. Samples heat-treated at up to 1473 K after implantation show less uniform lattice swelling that varies significantly from grain to grain compared to as-implanted samples. An increase in lattice swelling is found in the vicinity of some grain boundaries, even at depths beyond the implanted layer. As a result, these findings are discussed in terms of the evolution of helium-ion-implantation-induced defects.

  13. Gas porosity evolution and ion-implanted helium behavior in reactor ferritic/martensitic and austenitic steels

    NASA Astrophysics Data System (ADS)

    Chernov, I. I.; Kalin, B. A.; Staltsov, M. S.; Oo, Kyi Zin; Binyukova, S. Yu.; Staltsova, O. S.; Polyansky, A. A.; Ageev, V. S.; Nikitina, A. A.

    2015-04-01

    The peculiarities of gas porosity formation and helium retention and release in reactor ferritic/martensitic EP-450 and EP-450-ODS and austenitic ChS-68 steels are investigated by transmission electron microscopy and helium thermal desorption spectrometry (HTDS). The samples were irradiated by 40 keV He+ ions up to a fluence of 5 · 1020 m-2 at 293 and 923 K. An nonuniform distribution of helium bubbles and high-level gas swelling in ferritic/martensitic steels were found at high-temperature helium implantation. The same irradiation conditions result in formation of uniformly distributed helium bubbles and low-level swelling in ChS-68 steel. Temperature range of helium release from EP-450-ODS steel was considerably wider in comparison to HTDS-spectra of the EP-450 steel. A considerable quantity of helium is released from ODS steel in the high-temperature range after the main peak of the HTDS-spectrum.

  14. Bending tests on T91 samples implanted with 0.25 at.% helium: Experiments and mechanical analysis

    NASA Astrophysics Data System (ADS)

    Henry, J.; Vincent, L.; Averty, X.; Marini, B.; Jung, P.

    2006-09-01

    In order to investigate helium effects on the fracture properties of martensitic mod 9Cr-1Mo (T91) steel, miniature Charpy specimens were implanted at 250 °C in the notch region to 0.25 at.% helium using a degraded 34 MeV 3He ion beam and subsequently submitted to static bending tests at room temperature. For the six implanted specimens, a 'pop-in' phenomenon, which is an arrested unstable crack extension, was systematically recorded during testing. In the implanted zones of the samples, the fracture mode was fully brittle with both intergranular and cleavage fracture, whereas for unimplanted samples tested at -170 °C, the fracture mode was found to be 100% cleavage. Finite element simulations of the tests performed on unimplanted and implanted specimens were also carried out to determine stress and strain fields at the onset of crack propagation. Based on these computations, the fracture toughness of implanted T91 was tentatively evaluated using the Beremin model of the local approach to brittle fracture.

  15. Peeling off the Mask: Pseudo Myocardial Infarction Pattern on Electrocardiogram During AICD Implantation

    PubMed Central

    Kumar, Sudeep; Kapoor, Aditya; Moorthy, Nagaraja; Lokhandwala, Yash

    2016-01-01

    Lead induced transient right bundle branch block is not uncommon during pacemaker implantation. We describe a patient with old anterior wall myocardial infarction with severe left ventricular dysfunction presenting with recurrent ventricular tachycardia who developed transient right bundle branch block and pseudomyocardial infacrction pattern during AICD implantation. PMID:25852248

  16. Effect of simultaneous helium implantation on the microstructure evolution of Inconel X-750 superalloy during dual-beam irradiation

    NASA Astrophysics Data System (ADS)

    Changizian, P.; Zhang, H. K.; Yao, Z.

    2015-12-01

    This study focuses on investigation into the effect of helium implantation on microstructure evolution in Inconel X-750 superalloy during dual-beam (Ni+/He+) irradiation. The 1 MeV Ni+ ions with the damage rate of 10-3 dpa/s as well as 15 keV He+ ions using rate of 200 appm/dpa were simultaneously employed to irradiate specimens at 400 °C to different doses. Microstructure characterization has been conducted using high-resolution analytical transmission electron microscopy (TEM). The TEM results show that simultaneous helium injection has significant influence on irradiation-induced microstructural changes. The disordering of γ‧ (Ni3 (Al, Ti)) precipitates shows noticeable delay in dose level compared to mono heavy ion irradiation, which is attributed to the effect of helium on promoting the dynamic reordering process. In contrast to previous studies on single-beam ion irradiation, in which no cavities were reported even at high doses, very small (2-5 nm) cavities were detected after irradiation to 5 dpa, which proved that helium plays crucial role in cavity formation. TEM characterization also indicates that the helium implantation affects the development of dislocation loops during irradiation. Large 1/3 <1 1 1> Frank loops in the size of 10-20 nm developed during irradiation at 400 °C, whereas similar big loops detected at higher irradiation temperature (500 °C) during sole ion irradiation. This implies that the effect of helium on trapping the vacancies can help to develop the interstitial Frank loops at lower irradiation temperatures.

  17. Strain Doping: Reversible Single-Axis Control of a Complex Oxide Lattice via Helium Implantation

    NASA Astrophysics Data System (ADS)

    Guo, Hangwen; Dong, Shuai; Rack, Philip D.; Budai, John D.; Beekman, Christianne; Gai, Zheng; Siemons, Wolter; Gonzalez, C. M.; Timilsina, R.; Wong, Anthony T.; Herklotz, Andreas; Snijders, Paul C.; Dagotto, Elbio; Ward, Thomas Z.

    2015-06-01

    We report on the use of helium ion implantation to independently control the out-of-plane lattice constant in epitaxial La0.7Sr0.3MnO3 thin films without changing the in-plane lattice constants. The process is reversible by a vacuum anneal. Resistance and magnetization measurements show that even a small increase in the out-of-plane lattice constant of less than 1% can shift the metal-insulator transition and Curie temperatures by more than 1 0 0 °C . Unlike conventional epitaxy-based strain tuning methods which are constrained not only by the Poisson effect but by the limited set of available substrates, the present study shows that strain can be independently and continuously controlled along a single axis. This permits novel control over orbital populations through Jahn-Teller effects, as shown by Monte Carlo simulations on a double-exchange model. The ability to reversibly control a single lattice parameter substantially broadens the phase space for experimental exploration of predictive models and leads to new possibilities for control over materials' functional properties.

  18. Strain Doping: Reversible Single-Axis Control of a Complex Oxide Lattice via Helium Implantation.

    PubMed

    Guo, Hangwen; Dong, Shuai; Rack, Philip D; Budai, John D; Beekman, Christianne; Gai, Zheng; Siemons, Wolter; Gonzalez, C M; Timilsina, R; Wong, Anthony T; Herklotz, Andreas; Snijders, Paul C; Dagotto, Elbio; Ward, Thomas Z

    2015-06-26

    We report on the use of helium ion implantation to independently control the out-of-plane lattice constant in epitaxial La(0.7)Sr(0.3)MnO(3) thin films without changing the in-plane lattice constants. The process is reversible by a vacuum anneal. Resistance and magnetization measurements show that even a small increase in the out-of-plane lattice constant of less than 1% can shift the metal-insulator transition and Curie temperatures by more than 100 °C. Unlike conventional epitaxy-based strain tuning methods which are constrained not only by the Poisson effect but by the limited set of available substrates, the present study shows that strain can be independently and continuously controlled along a single axis. This permits novel control over orbital populations through Jahn-Teller effects, as shown by Monte Carlo simulations on a double-exchange model. The ability to reversibly control a single lattice parameter substantially broadens the phase space for experimental exploration of predictive models and leads to new possibilities for control over materials' functional properties. PMID:26197138

  19. Surface studies and implanted helium measurements following NOVA high-yield DT experiments

    SciTech Connect

    Stoyer, M.A.; Hudson, G.B.

    1997-02-18

    This paper presents the results of three March 6, 1996 direct-drive high-yield DT NOVA experiments and provides `proof-of-principal` results for the quantitative measurement of energetic He ions. Semiconductor quality Si wafers and an amorphous carbon wafer were exposed to NOVA high-yield implosions. Surface damage was sub-micron in general, although the surface ablation was slightly greater for the carbon wafer than for the Si wafers. Melting of a thin ({approx} 0.1{mu}) layer of Si was evident from microscopic investigation. Electron microscopy indicated melted blobs of many different metals (e.g. Al, Au, Ta, Fe alloys, Cu and even Cd) on the surfaces. The yield measured by determining the numbers of atoms of implanted {sup 4}He and {sup 3}He indicate the number of DT fusions to be 9.1({plus_minus}2.3) X 10{sup 12} and DD fusions to be 4.8({plus_minus}1.0) x 10{sup 10}, respectively. The helium DT fusion yield is slightly lower than that of the Cu activation measurement, which was 1.3({plus_minus}0.l) x 10{sup 13} DT fusions.

  20. Fabrication of porous TiO2 nanorod array photoelectrodes with enhanced photoelectrochemical water splitting by helium ion implantation.

    PubMed

    Liu, Yichao; Shen, Shaohua; Ren, Feng; Chen, Jianan; Fu, Yanming; Zheng, Xudong; Cai, Guangxu; Xing, Zhuo; Wu, Hengyi; Jiang, Changzhong

    2016-05-19

    Porous photoelectrodes show high efficiency in hydrogen production by water splitting. However, fabrication of porous nanorods is usually difficult. Here, we report a simple approach to fabricate a kind of novel porous rutile titanium dioxide nanorod array by an advanced ion implantation method using multiple-energy helium ion implantation and subsequent annealing. The porous nanostructure enhances the photoelectrochemical performance of the titanium dioxide nanorod array photoelectrodes under Uv-visible light illumination, where the highest photocurrent density was relatively about 10 times higher than that of the pristine titanium dioxide nanorod array. The formation of nanocavities mainly contributes to the enhancement of the photocurrent density by trapping holes inside to separate the charge carriers. The study demonstrates that ion implantation could be an effective approach to develop novel porous nanostructural photoelectrodes for the application of hydrogen production. PMID:27145900

  1. Investigation Of Helium Implanted Fe-Cr Alloys By Means Of X-Ray Diffraction And Positron Annihilation Spectroscopy

    NASA Astrophysics Data System (ADS)

    Novák, Patrik; Gokhman, Aleksandr; Dobročka, Edmund; Bokor, Jozef; Pecko, Stanislav

    2015-11-01

    X-ray diffraction (XRD) and positron annihilation spectroscopy (PAS) have been used for the characterization of the two binary alloys Fe-Cr with Cr content 2.36 and 8.39 wt%. The influence of ion implantation on these alloys was studied. Different implantation doses of helium, up to 0.5 C/cm2, were used to simulate neutron-induced damage in a sub-surface region. To characterize the damage, a lattice parameter, coherent domain size, residual stress and a crystallographic texture have been studied by grazing incidence X-ray diffraction (GIXRD). It was found out that these parameters showed a similar dependence on the implantation dose as the positron lifetime determined by positron annihilation spectroscopy.

  2. Spatial release from masking in children with bilateral cochlear implants and with normal hearing: Effect of target-interferer similarity

    PubMed Central

    Misurelli, Sara M.; Litovsky, Ruth Y.

    2015-01-01

    In complex auditory environments, it is often difficult to separate a target talker from interfering speech. For normal hearing (NH) adult listeners, similarity between the target and interfering speech leads to increased difficulty in separating them; that is, informational masking occurs due to confusability of the target and interferers. This study investigated performance of children with bilateral cochlear implants (BiCIs) when target and interferers were either same-sex (male) talkers, or different-sex talkers (male target, female interferer). Comparisons between children with BiCIs and NH, when matched for age, were also conducted. Speech intelligibility was measured for target and interferers spatially co-located, or spatially separated with the interferers positioned symmetrically (+90° and −90°) or asymmetrically (both at +90°, right). Spatial release from masking (SRM) was computed as the difference between co-located and separated conditions. Within group BiCI comparisons revealed that in the co-located condition speech intelligibility was worse with the same-sex vs different-sex stimuli. There was also a trend for more SRM with the same-sex vs different-sex stimuli. When comparing BiCI to NH listeners, SRM was larger for the NH groups, suggesting that NH children are better able to make use of spatial cues to improve speech understanding in noise. PMID:26233032

  3. Spatial release from masking in children with bilateral cochlear implants and with normal hearing: Effect of target-interferer similarity.

    PubMed

    Misurelli, Sara M; Litovsky, Ruth Y

    2015-07-01

    In complex auditory environments, it is often difficult to separate a target talker from interfering speech. For normal hearing (NH) adult listeners, similarity between the target and interfering speech leads to increased difficulty in separating them; that is, informational masking occurs due to confusability of the target and interferers. This study investigated performance of children with bilateral cochlear implants (BiCIs) when target and interferers were either same-sex (male) talkers, or different-sex talkers (male target, female interferer). Comparisons between children with BiCIs and NH, when matched for age, were also conducted. Speech intelligibility was measured for target and interferers spatially co-located, or spatially separated with the interferers positioned symmetrically (+90° and -90°) or asymmetrically (both at +90°, right). Spatial release from masking (SRM) was computed as the difference between co-located and separated conditions. Within group BiCI comparisons revealed that in the co-located condition speech intelligibility was worse with the same-sex vs different-sex stimuli. There was also a trend for more SRM with the same-sex vs different-sex stimuli. When comparing BiCI to NH listeners, SRM was larger for the NH groups, suggesting that NH children are better able to make use of spatial cues to improve speech understanding in noise. PMID:26233032

  4. Fabrication of porous TiO2 nanorod array photoelectrodes with enhanced photoelectrochemical water splitting by helium ion implantation

    NASA Astrophysics Data System (ADS)

    Liu, Yichao; Shen, Shaohua; Ren, Feng; Chen, Jianan; Fu, Yanming; Zheng, Xudong; Cai, Guangxu; Xing, Zhuo; Wu, Hengyi; Jiang, Changzhong

    2016-05-01

    Porous photoelectrodes show high efficiency in hydrogen production by water splitting. However, fabrication of porous nanorods is usually difficult. Here, we report a simple approach to fabricate a kind of novel porous rutile titanium dioxide nanorod array by an advanced ion implantation method using multiple-energy helium ion implantation and subsequent annealing. The porous nanostructure enhances the photoelectrochemical performance of the titanium dioxide nanorod array photoelectrodes under Uv-visible light illumination, where the highest photocurrent density was relatively about 10 times higher than that of the pristine titanium dioxide nanorod array. The formation of nanocavities mainly contributes to the enhancement of the photocurrent density by trapping holes inside to separate the charge carriers. The study demonstrates that ion implantation could be an effective approach to develop novel porous nanostructural photoelectrodes for the application of hydrogen production.Porous photoelectrodes show high efficiency in hydrogen production by water splitting. However, fabrication of porous nanorods is usually difficult. Here, we report a simple approach to fabricate a kind of novel porous rutile titanium dioxide nanorod array by an advanced ion implantation method using multiple-energy helium ion implantation and subsequent annealing. The porous nanostructure enhances the photoelectrochemical performance of the titanium dioxide nanorod array photoelectrodes under Uv-visible light illumination, where the highest photocurrent density was relatively about 10 times higher than that of the pristine titanium dioxide nanorod array. The formation of nanocavities mainly contributes to the enhancement of the photocurrent density by trapping holes inside to separate the charge carriers. The study demonstrates that ion implantation could be an effective approach to develop novel porous nanostructural photoelectrodes for the application of hydrogen production. Electronic

  5. Wafer topography modeling for ionic implantation mask correction dedicated to 2x nm FDSOI technologies

    NASA Astrophysics Data System (ADS)

    Michel, Jean-Christophe; Le Denmat, Jean-Christophe; Sungauer, Elodie; Robert, Frédéric; Yesilada, Emek; Armeanu, Ana-Maria; Entradas, Jorge; Sturtevant, John L.; Do, Thuy; Granik, Yuri

    2013-04-01

    Reflection by wafer topography and underlying layers during optical lithography can cause unwanted exposure in the resist [1]. This wafer stack effect phenomenon which is neglected for larger nodes than 45nm, is becoming problematic for 32nm technology node and below at the ionic implantation process. This phenomenon is expected to be attenuated by the use of anti-reflecting coating but increases process complexity and adds cost and cycle time penalty. As a consequence, an OPC based solution is today under evaluation to cope with stack effects involved in ionic implantation patterning [2] [3]. For the source drain (SD) ionic implantation process step on 28nm Fully Depleted Silicon-on-Insulator (FDSOI) technology, active silicon areas, poly silicon patterns, Shallow Trench Isolation (STI), Silicon-on-Insulator (SOI) areas and the transitions between these different regions result in significant SD implant pattern critical dimension variations. The large number of stack variations involved in these effects implies a complex modeling to simulate pattern degradations. This paper deals with the characterization of stack effects on 28nm node using SOI substrates. The large number of measurements allows to highlight all individual and combined stack effects. A new modeling flow has been developed in order to generate wafer stack aware OPC model. The accuracy and the prediction of the model is presented in this paper.

  6. High-resolution, high-throughput, positive-tone patterning of poly(ethylene glycol) by helium beam exposure through stencil masks.

    PubMed

    Cacao, Eliedonna E; Nasrullah, Azeem; Sherlock, Tim; Kemper, Steven; Kourentzi, Katerina; Ruchhoeft, Paul; Stein, Gila E; Willson, Richard C

    2013-01-01

    In this work, a collimated helium beam was used to activate a thiol-poly(ethylene glycol) (SH-PEG) monolayer on gold to selectively capture proteins in the exposed regions. Protein patterns were formed at high throughput by exposing a stencil mask placed in proximity to the PEG-coated surface to a broad beam of helium particles, followed by incubation in a protein solution. Attenuated Total Reflectance-Fourier Transform Infrared Spectroscopy (ATR-FTIR) spectra showed that SH-PEG molecules remain attached to gold after exposure to beam doses of 1.5-60 µC/cm(2) and incubation in PBS buffer for one hour, as evidenced by the presence of characteristic ether and methoxy peaks at 1120 cm(-1) and 2870 cm(-1), respectively. X-ray Photoelectron Spectroscopy (XPS) spectra showed that increasing beam doses destroy ether (C-O) bonds in PEG molecules as evidenced by the decrease in carbon C1s peak at 286.6 eV and increased alkyl (C-C) signal at 284.6 eV. XPS spectra also demonstrated protein capture on beam-exposed PEG regions through the appearance of a nitrogen N1s peak at 400 eV and carbon C1s peak at 288 eV binding energies, while the unexposed PEG areas remained protein-free. The characteristic activities of avidin and horseradish peroxidase were preserved after attachment on beam-exposed regions. Protein patterns created using a 35 µm mesh mask were visualized by localized formation of insoluble diformazan precipitates by alkaline phosphatase conversion of its substrate bromochloroindoyl phosphate-nitroblue tetrazolium (BCIP-NBT) and by avidin binding of biotinylated antibodies conjugated on 100 nm gold nanoparticles (AuNP). Patterns created using a mask with smaller 300 nm openings were detected by specific binding of 40 nm AuNP probes and by localized HRP-mediated deposition of silver nanoparticles. Corresponding BSA-passivated negative controls showed very few bound AuNP probes and little to no enzymatic formation of diformazan precipitates or silver nanoparticles

  7. Forward-Masked Frequency Selectivity Improvements in Simulated and Actual Cochlear Implant Users Using a Preprocessing Algorithm.

    PubMed

    Langner, Florian; Jürgens, Tim

    2016-01-01

    Frequency selectivity can be quantified using masking paradigms, such as psychophysical tuning curves (PTCs). Normal-hearing (NH) listeners show sharp PTCs that are level- and frequency-dependent, whereas frequency selectivity is strongly reduced in cochlear implant (CI) users. This study aims at (a) assessing individual shapes of PTCs in CI users, (b) comparing these shapes to those of simulated CI listeners (NH listeners hearing through a CI simulation), and (c) increasing the sharpness of PTCs using a biologically inspired dynamic compression algorithm, BioAid, which has been shown to sharpen the PTC shape in hearing-impaired listeners. A three-alternative-forced-choice forward-masking technique was used to assess PTCs in 8 CI users (with their own speech processor) and 11 NH listeners (with and without listening through a vocoder to simulate electric hearing). CI users showed flat PTCs with large interindividual variability in shape, whereas simulated CI listeners had PTCs of the same average flatness, but more homogeneous shapes across listeners. The algorithm BioAid was used to process the stimuli before entering the CI users' speech processor or the vocoder simulation. This algorithm was able to partially restore frequency selectivity in both groups, particularly in seven out of eight CI users, meaning significantly sharper PTCs than in the unprocessed condition. The results indicate that algorithms can improve the large-scale sharpness of frequency selectivity in some CI users. This finding may be useful for the design of sound coding strategies particularly for situations in which high frequency selectivity is desired, such as for music perception. PMID:27604785

  8. Binaural release from masking with single- and multi-electrode stimulation in children with cochlear implants.

    PubMed

    Todd, Ann E; Goupell, Matthew J; Litovsky, Ruth Y

    2016-07-01

    Cochlear implants (CIs) provide children with access to speech information from a young age. Despite bilateral cochlear implantation becoming common, use of spatial cues in free field is smaller than in normal-hearing children. Clinically fit CIs are not synchronized across the ears; thus binaural experiments must utilize research processors that can control binaural cues with precision. Research to date has used single pairs of electrodes, which is insufficient for representing speech. Little is known about how children with bilateral CIs process binaural information with multi-electrode stimulation. Toward the goal of improving binaural unmasking of speech, this study evaluated binaural unmasking with multi- and single-electrode stimulation. Results showed that performance with multi-electrode stimulation was similar to the best performance with single-electrode stimulation. This was similar to the pattern of performance shown by normal-hearing adults when presented an acoustic CI simulation. Diotic and dichotic signal detection thresholds of the children with CIs were similar to those of normal-hearing children listening to a CI simulation. The magnitude of binaural unmasking was not related to whether the children with CIs had good interaural time difference sensitivity. Results support the potential for benefits from binaural hearing and speech unmasking in children with bilateral CIs. PMID:27475132

  9. Effect of pre-implanted helium on void swelling evolution in self-ion irradiated HT9

    NASA Astrophysics Data System (ADS)

    Getto, E.; Jiao, Z.; Monterrosa, A. M.; Sun, K.; Was, G. S.

    2015-07-01

    Void evolution in Fe++-irradiated ferritic-martensitic alloy HT9 was characterized in the temperature range of 400-480 °C between doses of 25 and 375 displacements per atom (dpa) with pre-implanted helium levels of 0-100 appm. A systematic study using depth profiling in cross-section samples was conducted to determine a valid region of analysis between 300 and 700 nm from the surface, which excluded effects due to the injected interstitial and the surface. Pre-implanted helium was found to promote void swelling at low doses by shortening the nucleation regime and to retard void growth at doses in the transient regime by enhancement of nucleation of small voids. Swelling was found to peak at a temperature of 460 °C. The primary effect of temperature was on the nucleation regime; nucleation regime was the shortest at 460 °C compared to that at 440 and 480 °C. The growth rate of voids was temperature-invariant. Steady state swelling was reached at 460 °C between 188 and 375 dpa at a rate of 0.02%/dpa.

  10. Technique for fabricating a custom gingival mask using a maxillary complete-arch implant-supported fixed interim prosthesis with an integrated verification cast.

    PubMed

    Esguerra, Roxanna J

    2016-01-01

    The custom gingival mask technique duplicates the tissue contours created by an implant-supported fixed interim prosthesis, which has been verified for satisfactory esthetics, phonetics, hygiene access, and patient comfort. This allows the dental laboratory technician to accurately duplicate the contours of the interim prosthesis in the definitive prosthesis. The technique described also incorporates a cast verification step to ensure the accurate, passive fit of the definitive prosthesis while eliminating the duplicate impression copings and implant replicas typically required for a verification cast. PMID:26384534

  11. Lattice modification in KTiOPO4 by hydrogen and helium sequentially implantation in submicrometer depth

    NASA Astrophysics Data System (ADS)

    Ma, Changdong; Lu, Fei; Xu, Bo; Fan, Ranran

    2016-05-01

    We investigated lattice modification and its physical mechanism in H and He co-implanted, z-cut potassium titanyl phosphate (KTiOPO4). The samples were implanted with 110 keV H and 190 keV He, both to a fluence of 4 × 1016 cm-2, at room temperature. Rutherford backscattering/channeling, high-resolution x-ray diffraction, and transmission electron microscopy were used to examine the implantation-induced structural changes and strain. Experimental and simulated x-ray diffraction results show that the strain in the implanted KTiOPO4 crystal is caused by interstitial atoms. The strain and stress are anisotropic and depend on the crystal's orientation. Transmission electron microscopy studies indicate that ion implantation produces many dislocations in the as-implanted samples. Annealing can induce ion aggregation to form nanobubbles, but plastic deformation and ion out-diffusion prevent the KTiOPO4 surface from blistering.

  12. Structural and optical properties of rare-earth doped lithium niobate waveguides formed by MeV helium ion implantation

    SciTech Connect

    Herreros, B.; Lifante, G.; Cusso, F.; Kling, A.; Soares, J.C.; Silva, M.F. da; Townsend, P.D.; Chandler, P.J.

    1996-12-31

    Results of investigations of optical waveguides formed by high energy helium implantation into lithium niobate codoped with 5 mol% MgO and 1 mol% Tm{sup 3+} or 1 mol% Er{sup 3+} are reported. A comparative study of structural and luminescence properties between implanted and untreated samples has been performed by means of Rutherford backscattering (RBS) combined with channeling and photoluminescence methods, respectively in order to investigate residual lattice damage and the incorporation of the optical active rare earths. For the case of Tm a full substitutional incorporation of the optical active rare earths. For the case of Tm a full substitutional incorporation on the lithium site and a high crystal quality in both bulk and implanted waveguide material has been found. For Er doped lithium niobate the channeling results show a fraction of Er randomly incorporated or forming precipitates and a deterioration of the waveguide`s lattice. The optical investigations show in both cases only a slight broadening of the emission lines of the rare earths in the waveguides compared to the bulk material.

  13. Lattice swelling and modulus change in a helium-implanted tungsten alloy: X-ray micro-diffraction, surface acoustic wave measurements, and multiscale modelling

    SciTech Connect

    Hoffmann, F.; Nguyen-Manh, D.; Gilbert, M. R.; Beck, C. E.; Eliason, J. K.; Maznev, A. A.; Liu, W.; Armstrong, D. E.J.; Nelson, K. A.; Dudarev, S. L.

    2015-02-26

    Using X-ray micro-diffraction and surface acoustic wave spectroscopy, we measure lattice swelling and elastic modulus changes in aW-1% Re alloy after implantation with 3110 appm of helium. An observed lattice expansion of a fraction of a per cent gives rise to an order of magnitude larger reduction in the surface acoustic wave velocity. A multiscale model, combining elasticity and density functional theory, is applied to the interpretation of observations. The measured lattice swelling is consistent with the relaxation volume of self-interstitial and helium-filled vacancy defects that dominate the helium-implanted material microstructure. Larger scale atomistic simulations using an empirical potential confirm the findings of the elasticity and density functional theory model for swelling. The reduction of surface acoustic wave velocity predicted by density functional theory calculations agrees remarkably well with experimental observations.

  14. Simulation of nanostructure evolution under helium implantation in Fe-(2.5-12.5)at% Cr alloys at a temperature of 343 K

    NASA Astrophysics Data System (ADS)

    Gokhman, Aleksandr; Pecko, Stanislav; Slugeň, Vladimír

    2015-09-01

    Characterization of helium-implanted Fe-(2.5-12.5)at% Cr alloys with the flux of 7 × 10-6 dpa/s at a temperature of 343 K has been performed by means of cluster dynamics simulations. We have suggested a model for simulating an Fe-C-Cr system under helium implantation based on a selection of the latest data from atomistic studies and available experiments. Kinetics of carbon-vacancy and helium-vacancy complexes has been studied. Only one parameter is used to guarantee the best reproduction possible of experimental positron annihilation lifetime spectroscopy data for Fe-Cr alloys on dependences of vacancy cluster size on chromium content and irradiation dose via fitting. This is an effective binding energy of self-interstitial atoms to dislocation loops decorated by chromium atoms. It has a "snaky" dependence of chromium content with a minimum of about 9%Cr.

  15. Precipitates and defects in silicon co-implanted with helium and oxygen

    NASA Astrophysics Data System (ADS)

    Li, B. S.; Zhang, C. H.; Zhang, H. H.; Zhang, Y.; Yang, Y. T.; Zhang, L. Q.

    2011-04-01

    Nano-bubbles or voids introduced by He implantation before the oxygen implantation collect oxygen and increase the oxygen content in the sample. Furthermore, nano-bubbles or voids can trap Si interstitials to decrease the dislocations at the edge of precipitates. The density and shape of precipitates formed in the initial stage of the separation-by-implanted-oxygen process are related to the size and density of He-induced vacancy-type defects (nano-bubbles and voids). A high density of nano-bubbles is more efficient in gettering than that of a low density of voids.

  16. Helium ion-implanted InGaAsP tunnel junction current blocking layers

    NASA Astrophysics Data System (ADS)

    Wang, Hongsheng; Forrest, Stephen R.

    2002-08-01

    We experimentally investigate and model He+-implanted InGaAsP tunnel junctions used for lateral current confinement in vertical-cavity surface-emitting lasers (VCSELs). Prior to implantation, a 56-mum-diameter tunnel junction exhibits a peak-to-valley ratio of 2.2 and a differential resistance of 27 Omega at -2 V. After implantation at a dose of 3.3 x1013 cm-2, the current under reverse bias reduces by a factor of >107. Placing tunnel junctions close to the laser active region does not degrade the gain in the quantum wells. With He+-implanted tunnel junctions, mirrorless test VCSEL structures up to 50 mum diameter have uniform current distribution across the entire light-emitting apertures.

  17. Irradiation creep and microstructural changes of ODS steels of different Cr-contents during helium implantation under stress

    NASA Astrophysics Data System (ADS)

    Chen, J.; Jung, P.; Henry, J.; de Carlan, Y.; Sauvage, T.; Duval, F.; Barthe, M. F.; Hoffelner, W.

    2013-06-01

    Irradiation creep and microstructural changes of two ferritic ODS steels with 12% and 14% Cr have been studied by homogeneously implantation with helium under uniaxial tensile stresses from 40 to 300 MPa. The maximum dose was about 1.2 dpa (5000 appm-He) with displacement damage rates of 1 × 10-5 dpa/s at a temperature of 300 °C. Irradiation creep compliances were measured to be 4.0 × 10-6 dpa-1 MPa-1 and 10 × 10-6 dpa-1 MPa-1 for 12 and 14Cr ODS, respectively. Subsequently, microstructural evolution was studied in detail by TEM observations, showing dislocation loops and bubbles distributed homogenously in the matrix. Some bubbles were attached to ODS particles. Finally, the effects of Cr content on irradiation creep and microstructural changes are discussed, including earlier results of a 19Cr ODS and a PM2000 ferritic steel. Irradiation creep rates of both 12Cr and 14Cr-ODS ferritic steels a temperature of 300 °C show linear stress dependence up to 300 MPa at. Irradiation creep rate per dose rate and stress at a temperature of 300 °C amounts to 4.0 × 10-6 dpa-1 MPa-1 and 10 × 10-6 dpa-1 MPa-1 for 12Cr- and 14Cr-ODS, respectively. Irradiation creep properties are remarkably insensitive to Cr content, grain size and dispersoid size. Dislocation loops and helium bubbles are distributed homogenously in the matrix. In the case of high density fine dispersoids, most bubbles are attached to ODS particles. This may suppress loop formation as well as growth of bubbles, thereby increasing the resistance of ODS ferritic steels against helium embrittlement.

  18. Two-wavelength Raman study of poly(ethylene terephthalate) surfaces modified by helium plasma-based ion implantation

    NASA Astrophysics Data System (ADS)

    Veres, M.; Tóth, A.; Mohai, M.; Bertóti, I.; Szépvölgyi, J.; Tóth, S.; Himics, L.; Koós, M.

    2012-12-01

    The surface of poly(ethylene terephthalate) (PET) was modified by helium plasma-based ion implantation (He PBII). The untreated and surface modified samples were characterised with optical absorption spectroscopy and two-wavelength micro-Raman spectroscopy excited with 488 nm and 785 nm light sources, allowing to examine the chemical bonding configuration of the surface layers on different depths and by selective enhancement of vibrations of different structural units. Upon treatment, simultaneously with the development of the broad D and G bands, a gradual decrease of the peaks corresponding to the Cdbnd C stretching and Cdbnd O stretching modes were observed with both excitations. Downshifting and broadening were detected for the Cdbnd C peak with both excitations and also for the Cdbnd O peak with the 488 nm excitation due to formation of condensed aromatic rings. Oppositely, upshifting was found with 785 nm excitation for the Cdbnd O peak and especially for its broad shoulder newly developed at the high wavenumber side. The latter feature was assigned to Cdbnd O groups attached to polymer chains without conjugation and the bands behaviour was interpreted by breaking of the Cdbnd C bonds of the polymer, leading to the formation of a crosslinked, disordered and stressed structure with still intact Cdbnd O groups, due to the increased nuclear damage at the end of the ion track.

  19. Formation of amorphous carbon on the surface of poly(ethylene terephthalate) by helium plasma based ion implantation

    NASA Astrophysics Data System (ADS)

    Tóth, A.; Veres, M.; Kereszturi, K.; Mohai, M.; Bertóti, I.; Szépvölgyi, J.

    2011-08-01

    The surface modification of poly(ethylene terephthalate) (PET) by helium plasma based ion implantation (He PBII) was studied. The effect of the main process parameters (acceleration voltage, fluence and fluence rate) on the alterations of the surface chemical composition and structure were investigated by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. According to SRIM calculations, at ion energies above 2 keV the stopping power of PET for He + ions is dominated by the electronic component and the contribution of the nuclear component is relatively small. Degradation of the ester group and carbonisation were observed by XPS due to elimination of O-rich fragments. The total C-content of the modified layer increased with the increase of fluence rate and acceleration voltage of particles, enabling the purposeful alteration of the surface composition. A strong broadening was detected in the Raman spectrum between 1000 and 1700 cm -1, testifying to the intense formation of amorphous carbon. The area ratio of the D (˜1410 cm -1) to G (˜1570 cm -1) band increased with the increase of particle fluence and the increase of acceleration voltage, offering the possibility of tailoring the chemical structure of the amorphous carbon layer created by the He PBII treatment.

  20. Helium plasma implantation on metals: Nanostructure formation and visible-light photocatalytic response

    SciTech Connect

    Kajita, Shin; Yoshida, Tomoko; Kitaoka, Daiki; Etoh, Reo; Yajima, Miyuki; Ohno, Noriyasu; Yoshida, Hisao; Yoshida, Naoaki; Terao, Yoshitaka

    2013-04-07

    It has been found recently that low-energy helium (He) plasma irradiation to tungsten (W) leads to the growth of W nanostructures on the surface. The process to grow the nanostructure is identified as a self-growth process of He bubbles and has a potential to open up a new plasma processing method. Here, we show that the metallic nanostructure formation process by the exposure to He plasma can occur in various metals such as, titanium, nickel, iron, and so on. When the irradiation conditions alter, the metallic cone arrays including nanobubbles inside are formed on the surface. Different from W cases, other processes than growth of fiberform structure, i.e., physical sputtering and the growth of large He bubbles, can be dominant on other metals during irradiation; various surface morphology changes can occur. The nanostructured W, part of which was oxidized, has revealed a significant photocatalytic activity under visible light (wavelength >700 nm) in decolorization of methylene blue without any co-catalyst.

  1. Trapping and surface permeation of deuterium in helium-implanted stainless steel

    NASA Astrophysics Data System (ADS)

    Myers, S. M.; Wampler, W. R.

    1982-12-01

    Austenitic stainless steel was ion-implanted with deuterium (D) and He and then heated, with the depth distribution of D being monitored via the nuclear reaction 2D( 3He, p) 4He. Analysis using diffusion theory indicated that D is bound to He-associated traps with an enthalpy of 0.42 ± 0.08 eV referenced to a solution site. The trapping entities are believed to be ~1 nm He bubbles observed by transmission electron microscopy, with D being bound to the bubble walls by a mechanism similar to chemisorption. Irradiation-defect traps, probably vacancies, exhibited a strength of only 0.22 ± 0.08 eV. Trapping behavior was essentially the same for types 304 and 310 stainless steel, indicating little dependence upon the stability of the austenitic (fcc) phase. The rate of D release at the surface was determined in the temperature range 425-575 K for two kinds of surface, one oxidized by electropolishing and air exposure, the other sputtered with Fe ions. Release was proportional to the square of solution concentration in both cases, but the recombination coefficient was ≳100 times greater for the sputtered surface.

  2. Effects of source-to-listener distance and masking on perception of cochlear implant processed speech in reverberant rooms

    PubMed Central

    Whitmal, Nathaniel A.; Poissant, Sarah F.

    2009-01-01

    Two experiments examined the effects of source-to-listener distance (SLD) on sentence recognition in simulations of cochlear implant usage in noisy, reverberant rooms. Experiment 1 tested sentence recognition for three locations in the reverberant field of a small classroom (volume=79.2 m3). Subjects listened to sentences mixed with speech-spectrum noise that were processed with simulated reverberation followed by either vocoding (6, 12, or 24 spectral channels) or no further processing. Results indicated that changes in SLD within a small room produced only minor changes in recognition performance, a finding likely related to the listener remaining in the reverberant field. Experiment 2 tested sentence recognition for a simulated six-channel implant in a larger classroom (volume=175.9 m3) with varying levels of reverberation that could place the three listening locations in either the direct or reverberant field of the room. Results indicated that reducing SLD did improve performance, particularly when direct sound dominated the signal, but did not completely eliminate the effects of reverberation. Scores for both experiments were predicted accurately from speech transmission index values that modeled the effects of SLD, reverberation, and noise in terms of their effects on modulations of the speech envelope. Such models may prove to be a useful predictive tool for evaluating the quality of listening environments for cochlear implant users. PMID:19894835

  3. Effects of helium ion implantation on the surface morphology of tungsten at high temperature for the first wall armor and divertor plates of fusion reactors

    NASA Astrophysics Data System (ADS)

    Zenobia, Samuel J.

    Three devices at the University of Wisconsin-Madison Inertial Electrostatic Confinement (UW IEC) laboratory were used to implant W and W alloys with helium ions at high temperatures. These devices were HOMER, HELIOS, and the Materials Irradiation Experiment (MITE-E). The research presented in this thesis will focus on the experiments carried out utilizing the MITE-E. Early UW work in HOMER and HELIOS on silicon carbide, carbon velvet, W-coated carbon velvet, fine-grain W, nano-grain W, W needles, and single- and polycrystalline W showed that these materials were not resistant to He+ implantation above ˜800 °C. Unalloyed W developed a "coral-like" surface morphology after He+ implantation, but appeared to be the most robust material investigated. The MITE-E used an ion gun technology to implant tungsten with 30 keV He+. Tungsten specimens were implanted at 900 °C to total average fluences of 6x1016 -- 6x1018 He +/cm2. Other specimens were implanted to a total average fluence of 5x1018 He+/cm2 at temperatures between 500 and 900 °C. Micrographs of the implanted W specimens revealed the development of three distinct surface morphologies. These morphologies are classified as "blistering", "pitting", and "orientated ridges". Preferential sputtering of the W by the energetic He+ appears to be responsible for pitting and orientated ridges which developed at high fluences (1019 He+/cm2) in the MITE-E. While the orientated ridges were the dominant morphology on the W surface above 700 °C, the pitting was prevalent below 700 °C. The blister morphology was observed at all of the examined temperatures at fluences ≥5x1017 He+/cm2 but disappeared above fluences of 1019 He+/cm 2. The "coral-like" surface morphology on W inherent to He + implantation experiments in HOMER and HELIOS developed from a combination of sources: multiangular ion incidence, ion energy spread (softening), and electron field emission from nano-scale surface features induced by He + implantation. The

  4. Suppression of repetitive surface exfoliation of Inconel 625 implanted sequentially with helium ions of different energies (20 100 keV)

    NASA Astrophysics Data System (ADS)

    Rao, A. S.; Whitton, J. L.; Kaminsky, M.

    Studies were conducted to explore if the surface exfoliation of Inconel 625, typical for 100 keV 4He + irradiations can be reduced by pre-irradiating the surfaces with helium ions sequentially over the energy range 20 to 50 keV. Polished, polycrystalline Inconel 625 samples were irradiated at 298K and 573K with 4He + at six different energies in the range from 20 to 50 keV in an order of decreasing energies. For each energy the dose was 0.13 C/cm 2, resulting in a total dose of 0.89 C/cm 2. Subsequently, these samples were implanted with 100 keV 4He + to a dose of 1.0 C/cm 2 or 2.0 C/cm 2. The results reveal that the low energy 4He + implants prior to the 100 keV 4He + implant reduce significantly the erosion yield typical for 100-keV 4He + irradiations alone. For 573K these reduced yields are still about one order of magnitude greater than physical sputtering yields.

  5. Experimental location of helium atoms in 6H-SiC crystal lattice after implantation and after annealing at 400 °C

    NASA Astrophysics Data System (ADS)

    Linez, F.; Garrido, F.; Erramli, H.; Sauvage, T.; Courtois, B.; Desgardin, P.; Barthe, M.-F.

    2015-04-01

    The question of the helium behavior in silicon carbide has been studied at the atomic scale by numerical simulations, but no experiment has been carried out to assess the results hitherto. This paper describes the first experiments allowing this comparison. 6H-SiC single crystals were implanted with 50-keV He ions at a fluence of 1015 He/cm2 at room temperature. The as-received and as-implanted samples were analyzed by RBS and NRA in channeling mode along the main crystallographic planes and across three main axes. The measurements have shown that a portion of the He is located in the interstitial tetrahedral sites as predicted by the numerical simulations. The same measurements were performed on an implanted sample subsequently annealed at 400 °C under Ar atmosphere. They have shown that the quantity of He detected in interstitial tetrahedral sites TSi and TC has not significantly changed whereas that of He detected in the main crystallographic plane and in the main axis has increased. This increase is likely caused by He atoms migration at 400 °C toward interstitial positions located inside vacancies such as VSi and VSiVC. In parallel a partial recovery of the Si and C sublattices has been observed.

  6. Clay Mask Workshop

    ERIC Educational Resources Information Center

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  7. Quantitation of maxillary remodeling. 2. Masking of remodeling effects when an "anatomical" method of superimposition is used in the absence of metallic implants.

    PubMed

    Baumrind, S; Korn, E L; Ben-Bassat, Y; West, E E

    1987-06-01

    We report the results of a study aimed at quantifying the differences in the perceived pattern of maxillary remodeling that are observed when different methods are used to superimpose maxillary images in roentgenographic cephalometrics. In a previous article, we reported cumulative changes in the positions of anterior nasal spine (ANS), posterior nasal spine (PNS), and Point A for a sample of 31 subjects with maxillary metallic implants. Measurements had been made on lateral cephalograms taken at annual intervals relative to superimposition on the implants. In the present article, we quantify the differences in the perceived displacement of the same landmarks in the same sample when a standard "anatomical best bit" rule was used in lieu of superimposition on the implants. The anatomical best fit superimposition as herein defined was found in this sample to lose important information on the downward remodeling of the superior surface of the maxilla that had been detected when the implant superimposition was used. In fact, we observed a small artifactual upward displacement of the ANS-PNS line. In the anteroposterior direction, the tendency toward backward displacement of skeletal landmarks through time that had been detected with the implant superimposition was replaced by a small forward displacement of ANS and Point A together with reduced backward displacement of PNS. To the extent that the implant superimposition is to be considered the true and correct one, the anatomical best fit superimposition appears to understate the true downward remodeling of the palate by an average of about 0.3 and 0.4 mm per year, although this value differs at different ages and timepoints. The anatomical best fit superimposition also misses entirely the small mean tendency toward backward remodeling that was observed when the implant superimposition was used. In situations in which there are no implants, clinicians and research workers must necessarily continue to use anatomically

  8. Smoke Mask

    NASA Technical Reports Server (NTRS)

    2003-01-01

    Smoke inhalation injury from the noxious products of fire combustion accounts for as much as 80 percent of fire-related deaths in the United States. Many of these deaths are preventable. Smoke Mask, Inc. (SMI), of Myrtle Beach, South Carolina, is working to decrease these casualties with its line of life safety devices. The SMI personal escape hood and the Guardian Filtration System provide respiratory protection that enables people to escape from hazardous and unsafe conditions. The breathing filter technology utilized in the products is specifically designed to supply breathable air for 20 minutes. In emergencies, 20 minutes can mean the difference between life and death.

  9. Generation of ensembles of individually resolvable nitrogen vacancies using nanometer-scale apertures in ultrahigh-aspect ratio planar implantation masks.

    PubMed

    Bayn, Igal; Chen, Edward H; Trusheim, Matthew E; Li, Luozhou; Schröder, Tim; Gaathon, Ophir; Lu, Ming; Stein, Aaron; Liu, Mingzhao; Kisslinger, Kim; Clevenson, Hannah; Englund, Dirk

    2015-03-11

    A central challenge in developing magnetically coupled quantum registers in diamond is the fabrication of nitrogen vacancy (NV) centers with localization below ∼20 nm to enable fast dipolar interaction compared to the NV decoherence rate. Here, we demonstrate the targeted, high throughput formation of NV centers using masks with a thickness of 270 nm and feature sizes down to ∼1 nm. Super-resolution imaging resolves NVs with a full-width maximum distribution of 26 ± 7 nm and a distribution of NV-NV separations of 16 ± 5 nm. PMID:25621759

  10. Mask process simulation for mask quality improvement

    NASA Astrophysics Data System (ADS)

    Takahashi, Nobuyasu; Goto, So; Tsunoda, Dai; Shin, So-Eun; Lee, Sukho; Shon, Jungwook; Park, Jisoong

    2015-10-01

    Demand for mask process correction (MPC) is growing facing the 14nm era. We have developed model based MPC and can generate mask contours by using this mask process model. This mask process model consists of EB (development) and etch, which employs a threshold (level set) model and a variable bias model respectively. The model calibration tool accepts both CD measurement results and SEM images. The simulation can generate mask image (contour), runs with distributed computing resources, and has scalable performance. The contour simulation shows the accuracy of the MPC correction visually and provides comprehensive information about hot spots in mask fabrication. Additionally, it is possible to improve lithography simulation quality by providing a simulated mask contour. In this paper, accuracy and computational performance of mask process simulation are shown. The focus is on the difference between the calibration methods using CDs or images.

  11. Masks and Other Disguises.

    ERIC Educational Resources Information Center

    Ploghoft, Debra

    Instructions for making simple masks are provided in this guide for teachers of elementary children. Directions with illustrations are given for constructing masks from paper plates, construction paper, plastic milk jugs, and papier-mache. Ideas include a clown mask, a flower mask, a top hat, a paper crown, and "Groucho" glasses. Types of masks…

  12. Irradiation hardening of Fe-9Cr-based alloys and ODS Eurofer: Effect of helium implantation and iron-ion irradiation at 300 °C including sequence effects

    NASA Astrophysics Data System (ADS)

    Heintze, C.; Bergner, F.; Hernández-Mayoral, M.; Kögler, R.; Müller, G.; Ulbricht, A.

    2016-03-01

    Single-beam, dual-beam and sequential iron- and/or helium-ion irradiations are widely accepted to emulate more application-relevant but hardly accessible irradiation conditions of generation-IV fission and fusion candidate materials for certain purposes such as material pre-selection, identification of basic mechanisms or model calibration. However, systematic investigations of sequence effects capable to critically question individual approaches are largely missing. In the present study, sequence effects of iron-ion irradiations at 300 °C up to 5 dpa and helium implantations up to 100 appm He are investigated by means of post-irradiation nanoindentation of an Fe9%Cr model alloy, ferritic/martensitic 9%Cr steels T91 and Eurofer97 and oxide dispersion strengthened (ODS) Eurofer. Different types of sequence effects, both synergistic and antagonistic, are identified and tentative interpretations are suggested. It is found that different accelerated irradiation approaches have a great impact on the mechanical hardening. This stresses the importance of experimental design in attempts to emulate in-reactor conditions.

  13. Shuttle mask floorplanning

    NASA Astrophysics Data System (ADS)

    Xu, Gang; Tian, Ruiqi; Wong, Martin D.; Reich, Alfred J.

    2003-12-01

    A shuttle mask has different chips on the same mask. The chips are not electrically connected. Alliance and foundry customers can utilize shuttle masks to share the rising cost of mask and wafer manufacturing. This paper studies the shuttle mask floorplan problem, which is formulated as a rectangle-packing problem with constraints of final die sawing strategy and die-to-die mask inspection. For our formulation, we offer a "merging" method that reduces the problem to an unconstrained slicing floorplan problem. Excellent results are obtained from the experiment with real industry data. We also study a "general" method and discuss the reason why it does not work very well.

  14. Keeping African Masks Real

    ERIC Educational Resources Information Center

    Waddington, Susan

    2012-01-01

    Art is a good place to learn about our multicultural planet, and African masks are prized throughout the world as powerfully expressive artistic images. Unfortunately, multicultural education, especially for young children, can perpetuate stereotypes. Masks taken out of context lose their meaning and the term "African masks" suggests that there is…

  15. Mask degradation monitoring with aerial mask inspector

    NASA Astrophysics Data System (ADS)

    Tseng, Wen-Jui; Fu, Yung-Ying; Lu, Shih-Ping; Jiang, Ming-Sian; Lin, Jeffrey; Wu, Clare; Lifschitz, Sivan; Tam, Aviram

    2013-06-01

    As design rule continues to shrink, microlithography is becoming more challenging and the photomasks need to comply with high scanner laser energy, low CDU, and ever more aggressive RETs. This give rise to numerous challenges in the semiconductor wafer fabrication plants. Some of these challenges being contamination (mainly haze and particles), mask pattern degradation (MoSi oxidation, chrome migration, etc.) and pellicle degradation. Fabs are constantly working to establish an efficient methodology to manage these challenges mainly using mask inspection, wafer inspection, SEM review and CD SEMs. Aerial technology offers a unique opportunity to address the above mask related challenges using one tool. The Applied Materials Aera3TM system has the inherent ability to inspect for defects (haze, particles, etc.), and track mask degradation (e.g. CDU). This paper focuses on haze monitoring, which is still a significant challenge in semiconductor manufacturing, and mask degradation effects that are starting to emerge as the next challenge for high volume semiconductor manufacturers. The paper describes Aerial inspector (Aera3) early haze methodology and mask degradation tracking related to high volume manufacturing. These will be demonstrated on memory products. At the end of the paper we take a brief look on subsequent work currently conducted on the more general issue of photo mask degradation monitoring by means of an Aerial inspector.

  16. 2013 mask industry survey

    NASA Astrophysics Data System (ADS)

    Malloy, Matt

    2013-09-01

    A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance, and returns were included and new topics were added. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. While each year's survey includes minor updates based on feedback from past years and the need to collect additional data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for Semiconductors (ITRS).

  17. Mask industry assessment: 2004

    NASA Astrophysics Data System (ADS)

    Shelden, Gilbert V.; Hector, Scott D.

    2004-12-01

    Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of equipment for mask fabrication. This year's assessment is the third in the current series of annual reports and is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. This report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results may be used to guide future investments on critical path issues. This year's survey builds upon the 2003 survey to provide an ongoing database using the same questions as a baseline with only a few minor changes or additions. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services. Within each category are a many questions that create a detailed profile of both the business and technical status of the mask industry. This assessment includes inputs from ten major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market.

  18. The use of ion accelerators and synchrotron radiation to study the interactions of helium with metals

    SciTech Connect

    Donnelly, S.E.; Gilles, J.M.; Lucas, A.A.; Rife, J.C.

    1981-04-01

    A technique is described which examines the properties of helium trapped in bubbles in implanted metals. Helium implanted materials are characterized using resonant elastic proton backscattering and Transmission Electron Microscopy. Spectroscopic measurements using synchrotron radiation in the far vacuum ultraviolet are then performed to examine the density sensitive optical absorption resulting from the 1S - 2P transition in the implanted helium. Experimental data for helium implanted aluminum thin films are presented which indicate atomic densities in small (50A diameter) bubbles of the order of 10/sup 23/ atoms cm/sup -3/.

  19. Mask industry assessment: 2003

    NASA Astrophysics Data System (ADS)

    Kimmel, Kurt R.

    2003-12-01

    Microelectronics industry leaders routinely name mask technology and mask supply issues of cost and cycle time as top issues of concern. A survey was initiated in 2002 with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition.1 This paper presents the results of the second annual survey which is an enhanced version of the inaugural survey building upon its strengths and improving the weak points. The original survey was designed with the input of member company mask technologists, merchant mask suppliers, and industry equipment makers. The assessment is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the critical mask industry. An objective is to create a valuable reference to identify strengths and opportunities and to guide investments on critical-path issues. As subsequent years are added, historical profiles can also be created. This assessment includes inputs from ten major global merchant and captive mask manufacturers representing approximately 80% of the global mask market (using revenue as the measure) and making this the most comprehensive mask industry survey ever. The participating companies are: Compugraphics, Dai Nippon Printing, Dupont Photomask, Hoya, IBM, Infineon, Intel, Taiwan Mask Company, Toppan, and TSMC. Questions are grouped into five categories: General Business Profile Information; Data Processing; Yields and Yield loss Mechanisms; Delivery Time; and Returns and Services. Within each category are a multitude of questions that create a detailed profile of both the business and technical status of the mask industry.

  20. Helium Migration Mechanisms in Polycrystalline Uranium Dioxide

    SciTech Connect

    Martin, Guillaume; Desgardin, Pierre; Sauvage, Thierry; Barthe, Marie-France; Garcia, Philippe; Carlot, Gaelle

    2007-07-01

    This study aims at identifying the release mechanisms of helium in uranium dioxide. Two sets of polycrystalline UO{sub 2} sintered samples presenting different microstructures were implanted with {sup 3}He ions at concentrations in the region of 0.1 at.%. Changes in helium concentrations were monitored using two Nuclear Reaction Analysis (NRA) techniques based on the {sup 3}He(d,{alpha}){sup 1}H reaction. {sup 3}He release is measured in-situ during sample annealing at temperatures ranging between 700 deg. C and 1000 deg. C. Accurate helium depth profiles are generated after each annealing stage. Results that provide data for further understanding helium release mechanisms are discussed. It is found that helium diffusion appears to be enhanced above 900 deg. C in the vicinity of grain boundaries possibly as a result of the presence of defects. (authors)

  1. Object Substitution Masking: When Does Mask Preview Work?

    ERIC Educational Resources Information Center

    Lim, Stephen Wee Hun; Chua, Fook K.

    2008-01-01

    When a target is enclosed by a 4-dot mask that persists after the target disappears, target identification is worse than it is when the mask terminates with the target. This masking effect is attributed to object substitution masking (OSM). Previewing the mask, however, attenuates OSM. This study investigated specific conditions under which mask…

  2. Mask industry assessment: 2005

    NASA Astrophysics Data System (ADS)

    Shelden, Gilbert; Hector, Scott

    2005-11-01

    Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of equipment for mask fabrication. This year's assessment is the fourth in the current series of annual reports and is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. This report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results may be used to guide future investments on critical path issues. This year's survey contains all of the 2004 survey questions to provide an ongoing database. Additional questions were added to the survey covering operating cost factors and equipment utilization. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services, operating cost factors and equipment utilization. Within each category are a many questions that create a detailed profile of both the business and technical status of the mask industry. This assessment includes inputs from eight major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market. This participation rate is reduced by one captive from 2004. Note: Toppan, DuPont Photomasks Inc and AMTC (new) were consolidated into one input therefore the 2004 and 2005 surveys are basically equivalent.

  3. Mask and pattern characteristics

    NASA Technical Reports Server (NTRS)

    Routh, D. E.

    1972-01-01

    The use of the mask and pattern facility to include information on equipment accuracy, limitations, and pattern making capabilities is discussed. An insight is provided into potential areas of pattern applications, the sequence of mask making, as well as possible inputs and outputs available to the user.

  4. Mini Metal Masks.

    ERIC Educational Resources Information Center

    Henn, Cynthia

    2003-01-01

    Describes an art project used with kindergarten and first-grade students that focused on traditional African masks as part of a unit on the culture of West Africa. Discusses how the students created their clay masks. Includes lists of learning objectives and art materials. (CMK)

  5. Lightweight Face Mask

    NASA Technical Reports Server (NTRS)

    Cason, W. E. I.; Baucom, R. M.; Evans, R. C.

    1982-01-01

    Lightweight face mask originally developed to protect epileptic patients during seizures could have many other medical and nonmedical applications such as muscular distrophy patients, football linesmen and riot-control police. Masks are extremely lightweight, the lightest of the configurations weighing only 136 grams.

  6. Enhancement in Informational Masking

    ERIC Educational Resources Information Center

    Cao, Xiang; Richards, Virginia M.

    2012-01-01

    Purpose: The ability to detect a tone added to a random masker improves when a preview of the masker is provided. In 2 experiments, the authors explored the role that perceptual organization plays in this release from masking. Method: Detection thresholds were measured in informational masking studies. The maskers were drawn at random prior to…

  7. Mask industry assessment: 2006

    NASA Astrophysics Data System (ADS)

    Shelden, Gilbert; Marmillion, Patricia

    2006-10-01

    Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of semiconductor company mask technologists, merchant mask suppliers, and industry equipment makers. This year's assessment is the fifth in the current series of annual reports. With continued industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey is basically the same as the 2005 survey. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns and Services, Operating Cost Factors, and Equipment Utilization. Within each category is a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry.

  8. Mask industry assessment: 2009

    NASA Astrophysics Data System (ADS)

    Hughes, Greg; Yun, Henry

    2009-10-01

    Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH and administered by David Powell Consulting to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the eighth in the current series of annual reports. With ongoing industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey is basically the same as the 2005 through 2008 surveys. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category is a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry. This in combination with the past surveys represents a comprehensive view of changes in the industry.

  9. Mask industry assessment: 2008

    NASA Astrophysics Data System (ADS)

    Hughes, Greg; Yun, Henry

    2008-10-01

    Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH and administered by David Powell Consulting to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of semiconductor company mask technologists, merchant mask suppliers, and industry equipment makers. This year's assessment is the seventh in the current series of annual reports. With ongoing industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey is basically the same as the 2005 through 2007 surveys. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category is a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry.

  10. Mask Industry Assessment: 2007

    NASA Astrophysics Data System (ADS)

    Shelden, Gilbert; Marmillion, Patricia; Hughes, Greg

    2007-10-01

    Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of semiconductor company mask technologists, merchant mask suppliers, and industry equipment makers. This year's assessment is the sixth in the current series of annual reports. With ongoing industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey is basically the same as the 2005 and 2006 surveys. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns and Services, Operating Cost Factors, and Equipment Utilization. Within each category is a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry.

  11. Mask industry assessment: 2002

    NASA Astrophysics Data System (ADS)

    Kimmel, Kurt R.

    2002-12-01

    Microelectronics industry leaders routinely name mask technology and mask supply issues of cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of member company mask technologists, merchant mask suppliers, and industry equipment makers. This assessment can be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of our critical mask industry. It should serve as a valuable reference to identify strengths and opportunities and to guide investments on critical-path issues. Questions are grouped into five categories: General Business Profile Information; Data Processing; Yields and Yield loss Mechanisms; Delivery Time; and Returns and Services. Within each category are a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry.

  12. 2012 Mask Industry Survey

    NASA Astrophysics Data System (ADS)

    Malloy, Matt; Litt, Lloyd C.

    2012-11-01

    A survey supported by SEMATECH and administered by David Powell Consulting was sent to semiconductor industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. 2012 marks the 11th consecutive year for the mask industry survey. This year's survey and reporting structure are similar to those of the previous years with minor modifications based on feedback from past years and the need to collect additional data on key topics. Categories include general mask information, mask processing, data and write time, yield and yield loss, delivery times, and maintenance and returns. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. Results, initial observations, and key comparisons between the 2011 and 2012 survey responses are shown here, including multiple indications of a shift towards the manufacturing of higher end photomasks.

  13. Large area self-assembled masking for photonic applications

    NASA Astrophysics Data System (ADS)

    Nagy, N.; Pap, A. E.; Horváth, E.; Volk, J.; Bársony, I.; Deák, A.; Hórvölgyi, Z.

    2006-08-01

    Ordered porous structures for photonic application were fabricated on p- and n-type silicon by means of masking against ion implantation with Langmuir-Blodgett (LB) films. LB films from Stöber silica spheres [J. Colloid Interface Sci. 26, 62 (1968)] of 350nm diameter were applied in the boron and phosphorus ion-implantation step, thereby offering a laterally periodic doping pattern. Ordered porous silicon structures were obtained after performing an anodic etch and were then removed by alkaline etching resulting in the required two-dimensional photonic arrangement. The LB silica masks and the resulting silicon structures were studied by field emission scanning electron microscope analysis.

  14. Efficient oxygen gettering in Si by coimplantation of hydrogen and helium

    SciTech Connect

    Ou Xin; Koegler, Reinhard; Muecklich, Arndt; Skorupa, Wolfgang; Moeller, Wolfhard; Wang Xi; Gerlach, Juergen W.; Rauschenbach, Bernd

    2008-10-20

    Hydrogen preimplantation performed in addition to helium implantation efficiently shrinks the width of the gettering layer in Si and increases the empty volume fraction as well as the internal surface area per unit volume. The gettering efficiency for oxygen is significantly enhanced compared to the single helium implantation, and the helium implantation dose can be strongly reduced. The gas-filled bubble layer induced by the coimplantation of hydrogen and helium has the highest gettering efficiency for the oxygen accumulation. Direct evidence for oxygen gettering at the internal wall of the cavity is demonstrated by cross-sectional transmission electron microscopy.

  15. Masked Photocathode for Photoinjector

    SciTech Connect

    Qiang, Ji

    2010-01-21

    In this research note, we propose a scheme to insert a photocathode inside a photoinjector for generating high brightness electron beam. Instead of mounting the photocathode onto the electrode, a masked electrode with small hole is used to shield the photocathode from the accelerating vacuum chamber. Using such a masked photocathode will make the replacement of photocathode material very simple by rotating the photocathode behind the mask into the hole. This will significantly increase the usage lifetime of a photocathode. Furthermore, this also helps reduce the dark current or secondary electron emission from the photocathode. The hole on the mask also provides a transverse cut-off to the Gaussian laser profile which can be beneficial from the beam dynamics point of view.

  16. Protective Face Mask

    NASA Technical Reports Server (NTRS)

    1981-01-01

    Mask to protect the physically impaired from injuries to the face and head has been developed by Langley Research Center. It is made of composite materials, usually graphite or boron fibers woven into a matrix. Weighs less than three ounces.

  17. EUVL Mask Blank Repair

    SciTech Connect

    Barty, A; Mirkarimi, P; Stearns, D G; Sweeney, D; Chapman, H N; Clift, M; Hector, S; Yi, M

    2002-05-22

    EUV mask blanks are fabricated by depositing a reflective Mo/Si multilayer film onto super-polished substrates. Small defects in this thin film coating can significantly alter the reflected field and introduce defects in the printed image. Ideally one would want to produce defect-free mask blanks; however, this may be very difficult to achieve in practice. One practical way to increase the yield of mask blanks is to effectively repair multilayer defects, and to this effect they present two complementary defect repair strategies for use on multilayer-coated EUVL mask blanks. A defect is any area on the mask which causes unwanted variations in EUV dose in the aerial image obtained in a printing tool, and defect repair is correspondingly defined as any strategy that renders a defect unprintable during exposure. The term defect mitigation can be adopted to describe any strategy which renders a critical defect non-critical when printed, and in this regard a non-critical defect is one that does not adversely affect device function. Defects in the patterned absorber layer consist of regions where metal, typically chrome, is unintentionally added or removed from the pattern leading to errors in the reflected field. There currently exists a mature technology based on ion beam milling and ion beam assisted deposition for repairing defects in the absorber layer of transmission lithography masks, and it is reasonable to expect that this technology will be extended to the repair of absorber defects in EUVL masks. However, techniques designed for the repair of absorber layers can not be directly applied to the repair of defects in the mask blank, and in particular the multilayer film. In this paper they present for the first time a new technique for the repair of amplitude defects as well as recent results on the repair of phase defects.

  18. Helium solubility in SON68 nuclear waste glass

    SciTech Connect

    Fares, Toby; Peuget, Sylvain; Bouty, Olivier; Broudic, Veronique; Maugeri, Emilio; Bes, Rene; Jegou, Christophe; Chamssedine, Fadel; Sauvage, Thierry; Deschanels, Xavier

    2012-12-15

    Helium behavior in a sodium borosilicate glass (SON68) dedicated to the immobilization of high-level nuclear waste is examined. Two experimental approaches on nonradioactive glass specimens are implemented: pressurized helium infusion experiments and {sup 3}He ion implantation experiments. The temperature variation of helium solubility in SON68 glass was determined and analyzed with the harmonic oscillator model to determine values of the energy of interaction E(0) at the host sites (about -4000 J/mol), the vibration frequency (about 1.7 x 10{sup 11} s{sup -1}), and the density of solubility sites (2.2 x 10{sup 21} sites cm{sup -3}). The implantation experiments show that a non diffusive transport phenomenon (i.e., athermal diffusion) is involved in the material when the helium concentration exceeds 2.3 x 10{sup 21} He cm{sup -3}, and thus probably as soon as it exceeds the density of solubility sites accessible to helium in the glass. We propose that this transport mechanism could be associated with the relaxation of the stress gradient induced by the implanted helium profile, which is favored by the glass damage. Microstructural characterization by TEM and ESEM of glass specimens implanted with high helium concentrations showed a homogeneous microstructure free of bubbles, pores, or cracking at a scale of 10 nm. (authors)

  19. New mask technology challenges

    NASA Astrophysics Data System (ADS)

    Kimmel, Kurt R.

    2001-09-01

    Mask technology development has accelerated dramatically in recent years from the glacial pace of the last three decades to the rapid and sometimes simultaneous introductions of new wavelengths and mask-based resolution enhancement techniques. The nature of the semiconductor business has also become one driven by time-to-market as an overwhelming factor in capturing market share and profit. These are among the factors that have created enormous stress on the mask industry to produce masks with enhanced capabilities, such as phase-shifting attenuators, sub-resolution assist bars, and optical proximity correction (OPC) features, while maintaining or reducing cost and cycle time. The mask can no longer be considered a commodity item that is purchased form the lowest-cost supplier. Instead, it must now be promoted as an integral part of the technical and business case for a total lithographic solution. Improving partnership between designer, mask-maker, and wafer lithographer will be the harbinger of success in finding a profitable balance of capability, cost, and cycle time. Likewise for equipment infrastructure development, stronger partnership on the international level is necessary to control development cost and mitigate schedule and technical risks.

  20. Mask Industry Assessment: 2010

    NASA Astrophysics Data System (ADS)

    Hughes, Greg; Chan, David Y.

    2010-09-01

    A survey created supported by SEMATECH and administered by David Powell Consulting was sent to microelectronics industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the ninth in the current series of annual reports. With ongoing industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. It will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey was basically the same as the 2005 through 2009 surveys. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the critical mask industry. This profile combined with the responses to past surveys represents a comprehensive view of changes in the industry.

  1. Mask Industry Assessment: 2011

    NASA Astrophysics Data System (ADS)

    Chan, Y. David

    2011-11-01

    A survey supported by SEMATECH and administered by David Powell Consulting was sent to microelectronics industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the tenth in the current series of annual reports. With ongoing industry support, the report has been used as one of the baselines to gain perspective on the technical and business status of the mask and microelectronics industries. It continues to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey was essentially the same as the 2005 through 2010 surveys. Questions are grouped into following categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the critical mask industry. This profile combined with the responses to past surveys represents a comprehensive view of changes in the industry.

  2. Masks: The Artist in Me

    ERIC Educational Resources Information Center

    Skophammer, Karen

    2009-01-01

    Whether masks are made from cardboard, papier-mache, metal, wood, leather, fabric, clay or any combination of these materials, they bring out the artist in people. Young children like to wear masks when they play to pretend they were another person or animal. Masks let them fantasize and be creative. The author's students made masks representing…

  3. In situ probing of helium desorption from individual nanobubbles under electron irradiation

    SciTech Connect

    David, M.-L.; Pailloux, F.; Mauchamp, V.; Pizzagalli, L.

    2011-04-25

    The understanding of the mechanisms of helium bubble formation and evolution in materials requires the quantitative determination of several key quantities such as the helium density in the bubbles. Helium nanobubbles of about 16 nm in diameter were created in silicon by helium implantation at high fluence and subsequent annealing. Individual nanobubbles were analyzed by spatially resolved Electron Energy-loss Spectroscopy (EELS). We report on the in situ probing of helium desorption from the nanobubbles under electron irradiation. This opens new perspectives for a more accurate determination of the helium density through spatially resolved EELS.

  4. Overview of Mask Metrology

    NASA Astrophysics Data System (ADS)

    Rice, Bryan J.; Jindal, Vibhu; Lin, C. C.; Harris-Jones, Jenah; Kwon, Hyuk Joo; Ma, Hsing-Chien; Goldstein, Michael; Chan, Yau-Wai; Goodwin, Frank

    2011-11-01

    Extreme ultraviolet (EUV) lithography is the successor to optical lithography and will enable advanced patterning in semiconductor manufacturing processes down to the 8 nm half pitch technology node and beyond. However, before EUV can successfully be inserted into high volume manufacturing a few challenges must be overcome. Central among these remaining challenges is the requirement to produce "defect free" EUV masks. Mask blank defects have been one of the top challenges in the commercialization of extreme ultraviolet (EUV) lithography. To determine defect sources and devise mitigation solutions, detailed characterization of defects is critical. However, small defects pose challenges in metrology scale-up. SEMATECH has a comprehensive metrology strategy to address any defect larger than a 20 nm core size to obtain solutions for defect-free EUV mask blanks. SEMATECH's Mask Blank Development Center has been working since 2003 to develop the technology to support defect free EUV mask blanks. Since 2003, EUV mask blank defects have been reduced from 10000 of size greater than 100 nm to about a few tens at size 70 nm. Unfortunately, today's state of the art defect levels are still about 10 to 100 times higher than needed. Closing this gap requires progress in the various processes associated with glass substrate creation and multilayer deposition. That process development improvement in turn relies upon the availability of metrology equipment that can resolve and chemically characterize defects as small as 30 nm. The current defect reduction efforts at SEMATECH have intensively included a focus on inspection and characterization. The facility boasts nearly 100M of metrology hardware, including an FEI Titan TEM, Lasertec M1350 and M7360 tools, an actinic inspection tool, AFM, SPM, and scanning auger capabilities. The newly established Auger tool at SEMATECH can run a standard 6-inch mask blank and is already providing important information on sub-100 nm defects on EUV

  5. Spatial release from masking with noise-vocoded speech

    PubMed Central

    Freyman, Richard L.; Balakrishnan, Uma; Helfer, Karen S.

    2008-01-01

    This study investigated how confusability between target and masking utterances affects the masking release achieved through spatial separation. Important distinguishing characteristics between competing voices were removed by processing speech with six-channel envelope vocoding, which simulates some aspects of listening with a cochlear implant. In the first experiment, vocoded target nonsense sentences were presented against two-talker vocoded maskers in conditions that provide different spatial impressions but not reliable cues that lead to traditional release from masking. Surprisingly, no benefit of spatial separation was found. The absence of spatial release was hypothesized to be the result of the highly positive target-to-masker ratios necessary to understand vocoded speech, which may have been sufficient to reduce confusability. In experiment 2, words excised from the vocoded nonsense sentences were presented against the same vocoded two-talker masker in a four-alternative forced-choice detection paradigm where threshold performance was achieved at negative target-to-masker ratios. Here, the spatial release from masking was more than 20 dB. The results suggest the importance of signal-to-noise ratio in the observation of “informational” masking and indicate that careful attention should be paid to this type of masking as implant processing improves and listeners begin to achieve success in poorer listening environments. PMID:19045654

  6. Orion Emergency Mask Approach

    NASA Technical Reports Server (NTRS)

    Tuan, George C.; Graf, John C.

    2008-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction temperature and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  7. Orion Emergency Mask Approach

    NASA Technical Reports Server (NTRS)

    Tuan, George C.; Graf, John C.

    2009-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction time, breakthroughs, and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  8. Peculiarities of helium bubble formation and helium behavior in vanadium alloys of different chemical composition

    NASA Astrophysics Data System (ADS)

    Staltsov, М. S.; Chernov, I. I.; Kalin, B. A.; Oo, Kyi Zin; Polyansky, A. A.; Staltsova, O. S.; Aung, Kyaw Zaw; Chernov, V. M.; Potapenko, M. M.

    2015-06-01

    The influence of alloying of vanadium by Ti and Fe on helium bubble formation, gaseous swelling and helium release peculiarities is investigated by means of transmission electron microscopy and helium thermal desorption spectrometry (HTDS). The samples were irradiated by 40 keV He+ ions up to a fluence of 5 ṡ 1020 m-2 at 293 and 923 K. It is found that large faceted pores/bubbles are formed in pure vanadium and it has the highest gaseous swelling. Alloying by any used quantity of Ti (from 0.1 up to 10 wt.%) or Fe (from 1 up to 10 wt.%) essentially decreases the helium swelling. The effect of alloying of vanadium by Ti on the bubble sizes and the helium swelling is nonmonotonic. The density of bubbles increases significantly and their sizes and swelling grow monotonically with increasing the Fe content in vanadium. With low-temperature helium implantation, alloying of V by Ti shifts the HTDS peaks to higher temperatures and the temperatures of peaks are decreased with increasing the Fe concentration. A significant portion of the helium releases in a high-temperature area beyond the main peak temperatures in the HTDS spectra. It is assumed that this is caused by formation of helium bubbles on the surfaces of incoherent particles of secondary phases (oxides, nitrides), having high binding energies with these particles.

  9. Optical Forces on Metastable Helium

    NASA Astrophysics Data System (ADS)

    Corder, Christopher Scott

    Optical forces using lasers allow precise control over the motion of atoms. The bichromatic optical force (BF) is unique in its large magnitude and velocity range, arising from the absorption and stimulated emission processes. These properties were used to transversely collimate a beam of metastable helium (He*) using the 23S - 23P transition. The collimation created a very bright beam of He*, allowing experiments of neutral atom lithography. The He* beam was used to pattern material surfaces using a resist-based lithography technique, where the pattern was determined by either mechanical or optical masks. The optical masks produced features with a separation of half the wavelength of the light used. Patterning was successfully demonstrated with both IR and UV optical masks. The etched pattern resolution was ˜ 100 nm and limited by the material surface. Further experiments were performed studying the ability of the bichromatic force to cool. The finite velocity range of the BF allows estimation of a characteristic cooling time which is independent of the excited state lifetime, only depending on the atomic mass and optical transition energy. Past experiments, including the helium collimation used for neutral atom lithography, have demonstrated that the BF can collimate and longitudinally slow atomic beams, but required long interaction times that included many spontaneous emission (SE) events. The effect of SE can be mitigated, and is predicted to not be necessary for BF cooling. Since the BF cooling time is not related to the excited state lifetime, a transition can be chosen such that the cooling time is shorter than the SE cycle time, allowing direct laser cooling on atoms and molecules that do not have cycling transitions. Experiments using the helium 2 3S-3P transition were chosen because the BF cooling time (285 ns) is on the order of the average SE cycle time (260 ns). Numerical simulations of the experimental system were run predicting compression of the

  10. Masked mycotoxins: A review

    PubMed Central

    Berthiller, Franz; Crews, Colin; Dall'Asta, Chiara; Saeger, Sarah De; Haesaert, Geert; Karlovsky, Petr; Oswald, Isabelle P; Seefelder, Walburga; Speijers, Gerrit; Stroka, Joerg

    2013-01-01

    The aim of this review is to give a comprehensive overview of the current knowledge on plant metabolites of mycotoxins, also called masked mycotoxins. Mycotoxins are secondary fungal metabolites, toxic to human and animals. Toxigenic fungi often grow on edible plants, thus contaminating food and feed. Plants, as living organisms, can alter the chemical structure of mycotoxins as part of their defence against xenobiotics. The extractable conjugated or non-extractable bound mycotoxins formed remain present in the plant tissue but are currently neither routinely screened for in food nor regulated by legislation, thus they may be considered masked. Fusarium mycotoxins (deoxynivalenol, zearalenone, fumonisins, nivalenol, fusarenon-X, T-2 toxin, HT-2 toxin, fusaric acid) are prone to metabolisation or binding by plants, but transformation of other mycotoxins by plants (ochratoxin A, patulin, destruxins) has also been described. Toxicological data are scarce, but several studies highlight the potential threat to consumer safety from these substances. In particular, the possible hydrolysis of masked mycotoxins back to their toxic parents during mammalian digestion raises concerns. Dedicated chapters of this article address plant metabolism as well as the occurrence of masked mycotoxins in food, analytical aspects for their determination, toxicology and their impact on stakeholders. PMID:23047235

  11. Apodized Phase Mask Coronagraphs

    NASA Astrophysics Data System (ADS)

    Carlotti, Alexis

    2013-01-01

    Among the optical instruments proposed to detect and characterize exoplanets, phase masks coronagraphs offer very small inner working angles. Designed for off-axis telescopes, their performance is greatly reduced when used with centrally obstructed apertures such as those of the Palomar telescope, the very large telescope, or the James Webb space telescope. However, a clear circular aperture is not the only pupil shape for which a phase mask coronagraph can work properly. In fact, for a given centrally obstructed aperture, we show that it is possible to compute optimal apodizers that help achieve stellar extinction levels similar to those obtained in the ideal case of an off-axis telescope. Trade-offs exist between these levels, the transmission of the apodizer, and the area covered by the Lyot stop. We detail the Fourier optics formalism that makes these optimizations possible, as well as a few examples of shaped pupils. Some are designed for a four-quadrants phase mask, and some others for a vortex phase mask. We also offer a comparison with a coronagraph solely composed of a shaped pupil.

  12. Competing for Consciousness: Prolonged Mask Exposure Reduces Object Substitution Masking

    ERIC Educational Resources Information Center

    Goodhew, Stephanie C.; Visser, Troy A. W.; Lipp, Ottmar V.; Dux, Paul E.

    2011-01-01

    In object substitution masking (OSM) a sparse, temporally trailing 4-dot mask impairs target identification, even though it has different contours from, and does not spatially overlap with the target. Here, we demonstrate a previously unknown characteristic of OSM: Observers show reduced masking at prolonged (e.g., 640 ms) relative to intermediate…

  13. Mask Blank Defect Detection

    SciTech Connect

    Johnson, M A; Sommargren, G E

    2000-02-04

    Mask blanks are the substrates that hold the master patterns for integrated circuits. Integrated circuits are semiconductor devices, such as microprocessors (mPs), dynamic random access memory (DRAMs), and application specific integrated circuits (ASICs) that are central to the computer, communication, and electronics industries. These devices are fabricated using a set of master patterns that are sequentially imaged onto light-sensitive coated silicon wafers and processed to form thin layers of insulating and conductive materials on top of the wafer. These materials form electrical paths and transistors that control the flow of electricity through the device. For the past forty years the semiconductor industry has made phenomenal improvements in device functionality, compactness, speed, power, and cost. This progress is principally due to the exponential decrease in the minimum feature size of integrated circuits, which has been reduced by a factor of {radical}2 every three years. Since 1992 the Semiconductor Industry Association (SIA) has coordinated the efforts of producing a technology roadmap for semiconductors. In the latest document, ''The International Technology Roadmap for Semiconductors: 1999'', future technology nodes (minimum feature sizes) and targeted dates were specified and are summarized in Table 1. Lithography is the imaging technology for producing a de-magnified image of the mask on the wafer. A typical de-magnification factor is 4. Mask blank defects as small as one-eighth the equivalent minimum feature size are printable and may cause device failure. Defects might be the result of the surface preparation, such as polishing, or contamination due to handling or the environment. Table 2 shows the maximum tolerable defect sizes on the mask blank for each technology node. This downward trend puts a tremendous burden on mask fabrication, particularly in the area of defect detection and reduction. A new infrastructure for mask inspection will be

  14. Helium-Recycling Plant

    NASA Technical Reports Server (NTRS)

    Cook, Joseph

    1996-01-01

    Proposed system recovers and stores helium gas for reuse. Maintains helium at 99.99-percent purity, preventing water vapor from atmosphere or lubricating oil from pumps from contaminating gas. System takes in gas at nearly constant low back pressure near atmospheric pressure; introduces little or no back pressure into source of helium. Concept also extended to recycling of other gases.

  15. [Intubating laryngeal mask].

    PubMed

    Langenstein, H; Möller, F

    1998-01-01

    To improve the success of blind intubation through a laryngeal mask, Dr. A.I.J. Brain constructed the intubating laryngeal mask airway (ILMA), marketed under the name Fastrach. The new construction allows blind intubation with highly flexible endotracheal tubes up to 8 mm ID with cuff (straight Woodbridge type), securing the airway around the intubation process and maintaining most of the characteristics of a standard laryngeal mask airway (SLMA), including contraindications. An additional contraindication is the existence of a Zenker diverticle. Up to now, eight working groups reported a success rate of blind intubation through the ILMA of more than 90% in about 1,200 patients, with a success rate of blind intubation of more than 50% for the first intubation attempt. Ten percent of the patients were difficult to intubate with the same success rate for blind intubation as in normal patients. Reduced mouth opening does not seem to hinder the use of the ILMA in spite of its increased outer diameter of 2 cm, as long as it is possible to enlarge the mouth opening to > 2 cm during anaesthesia. The new ILMA more than doubles the success of blind intubation compared to an SLMA, irrespective of a large variety of intubation difficulties. Correct judgement of endotracheal tube position is mandatory. The ILMA has the potential to be used in patients who are difficult to intubate and to substitute the SLMA in "cannot ventilate--cannot intubate" situations. The future will show if the ILMA also will improve emergency airway management by inexperienced personnel, including intubation, as has been shown for the standard laryngeal mask airway in cardiopulmonary resuscitation for ventilation only. PMID:9611362

  16. Masked multichannel analyzer

    DOEpatents

    Winiecki, A.L.; Kroop, D.C.; McGee, M.K.; Lenkszus, F.R.

    1984-01-01

    An analytical instrument and particularly a time-of-flight-mass spectrometer for processing a large number of analog signals irregularly spaced over a spectrum, with programmable masking of portions of the spectrum where signals are unlikely in order to reduce memory requirements and/or with a signal capturing assembly having a plurality of signal capturing devices fewer in number than the analog signals for use in repeated cycles within the data processing time period.

  17. Masked multichannel analyzer

    DOEpatents

    Winiecki, Alan L.; Kroop, David C.; McGee, Marilyn K.; Lenkszus, Frank R.

    1986-01-01

    An analytical instrument and particularly a time-of-flight-mass spectrometer for processing a large number of analog signals irregularly spaced over a spectrum, with programmable masking of portions of the spectrum where signals are unlikely in order to reduce memory requirements and/or with a signal capturing assembly having a plurality of signal capturing devices fewer in number than the analog signals for use in repeated cycles within the data processing time period.

  18. Wavelength dependent mask defects

    NASA Astrophysics Data System (ADS)

    Badger, Karen; Butt, Shahid; Burnham, Jay; Faure, Tom; Hibbs, Michael; Rankin, Jed; Thibault, David; Watts, Andrew

    2005-05-01

    For years there has been a mismatch between the photomask inspection wavelength and the usage conditions. While the non-actinic inspection has been a source for concern, there has been essentially no evidence that a defect "escaped" the mask production process due to the inspection mismatch. This paper will describe the discovery of one such defect, as well as the diagnostic and inspection techniques used to identify the location, analyze the composition, and determine the source of the printed wafer defect. Conventional mask inspection techniques revealed no defects, however an actinic Aerial Image Metrology System (AIMS) revealed a 1.5 mm region on the mask with up to 59% transmission reduction at 193 nm. Further diagnostics demonstrated a strong wavelength dependence which accounted for the near invisibility of the defect at I line (365 nm) or even DUV (248 nm) wavelengths, which had 0% and 5% respective transmission reductions. Using some creative imaging techniques via AIMS tool and modeling, the defect was deduced to have a three dimensional Gaussian absorption character, with total width approximately 1.5 mm. Several non-destructive diagnostic techniques were developed to determine the composition and location of the defect within the substrate. These results will be described in addition to identifying methods for ensuring product quality in the absence of actinic inspection.

  19. Mask strategy at International SEMATECH

    NASA Astrophysics Data System (ADS)

    Kimmel, Kurt R.

    2002-08-01

    International SEMATECH (ISMT) is a consortium consisting of 13 leading semiconductor manufacturers from around the globe. Its objective is to develop the infrastructure necessary for its member companies to realize the International Technology Roadmap for Semiconductors (ITRS) through efficiencies of shared development resources and knowledge. The largest area of effort is lithography, recognized as a crucial enabler for microelectronics technology progress. Within the Lithography Division, most of the efforts center on mask-related issues. The development strategy at International SEMATCH will be presented and the interlock of lithography projects clarified. Because of the limited size of the mask production equipment market, the business case is weak for aggressive investment commensurate with the pace of the International Technology Roadmap for Semiconductors. With masks becoming the overwhelming component of lithography cost, new ways of reducing or eliminating mask costs are being explored. Will mask technology survive without a strong business case? Will the mask industry limit the growth of the semiconductor industry? Are advanced masks worth their escalating cost? An analysis of mask cost from the perspective of mask value imparted to the user is presented with examples and generic formulas for the reader to apply independently. A key part to the success for both International SEMATECH and the industry globally will be partnerships on both the local level between mask-maker and mask-user, and the macro level where global collaborations will be necessary to resolve technology development cost challenges.

  20. Nanostructures from hydrogen implantation of metals.

    SciTech Connect

    McWatters, Bruce Ray; Causey, Rion A.; DePuit, Ryan J.; Yang, Nancy Y. C.; Ong, Markus D.

    2009-09-01

    This study investigates a pathway to nanoporous structures created by hydrogen implantation in aluminum. Previous experiments for fusion applications have indicated that hydrogen and helium ion implantations are capable of producing bicontinuous nanoporous structures in a variety of metals. This study focuses specifically on hydrogen and helium implantations of aluminum, including complementary experimental results and computational modeling of this system. Experimental results show the evolution of the surface morphology as the hydrogen ion fluence increases from 10{sup 17} cm{sup -2} to 10{sup 18} cm{sup -2}. Implantations of helium at a fluence of 10{sup 18} cm{sup -2} produce porosity on the order of 10 nm. Computational modeling demonstrates the formation of alanes, their desorption, and the resulting etching of aluminum surfaces that likely drives the nanostructures that form in the presence of hydrogen.

  1. Mask industry assessment trend analysis

    NASA Astrophysics Data System (ADS)

    Shelden, Gilbert; Hector, Scott; Marmillion, Pat; Lercel, Michael

    2006-06-01

    Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. In 2002, a survey was created with support from SEMATECH and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of mask equipment. The 2005 survey was the fourth in the current series of annual surveys. The survey data can be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. The results may be used to guide future investments on critical path issues. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services, operating cost factors, and equipment utilization. Because the questions covering operating cost factors and equipment utilization were just added to the survey, no trend analysis is possible. Within each category are many questions that together create a detailed profile of both the business and technical status of the mask industry. The assessment participation has changed from year to year. The 2005 survey, for example, includes inputs from eight major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market.

  2. Masks of the Universe

    NASA Astrophysics Data System (ADS)

    Harrison, Edward

    2011-11-01

    Preface; Introducing the masks; Part I. Worlds in the Making: 1. The magic Universe; 2. The mythic Universe; 3. The geometric Universe; 4. The medieval Universe; 5. The infinite Universe; 6. The mechanistic Universe; Part II. The Heart Divine: 7. Dance of the atoms and waves; 8. Fabric of space and time; 9. Nearer to the heart's desire; 10. The cosmic tide; 11. Do dreams ever come true?; Part III. The Cloud of Unknowing: 12. The witch universe; 13. The spear of Archytas; 14. All that is made; 15. The cloud of unknowing; 16. Learned ignorance.

  3. Mask fabrication process

    DOEpatents

    Cardinale, Gregory F.

    2000-01-01

    A method for fabricating masks and reticles useful for projection lithography systems. An absorber layer is conventionally patterned using a pattern and etch process. Following the step of patterning, the entire surface of the remaining top patterning photoresist layer as well as that portion of an underlying protective photoresist layer where absorber material has been etched away is exposed to UV radiation. The UV-exposed regions of the protective photoresist layer and the top patterning photoresist layer are then removed by solution development, thereby eliminating the need for an oxygen plasma etch and strip and chances for damaging the surface of the substrate or coatings.

  4. Helium bubble evolution in a Zr–Sn–Nb–Fe–Cr alloy during post-annealing: An in-situ investigation

    SciTech Connect

    Shen, H.H.; Peng, S.M.; Chen, B.; Naab, F.N.; Sun, G.A.; Zhou, W.; Xiang, X.; Sun, K.; Zu, X.T.

    2015-09-15

    The formation of helium bubbles is considered to be detrimental to the mechanical performance of the nuclear materials. The growth behaviors of helium bubbles in a helium ion implanted Zr–Sn–Nb–Fe–Cr alloy with respect to the helium fluence and subsequently annealing procedure were investigated by in-situ transmission electron microscopy. In the as-implanted sample, the measured size distributions of the helium bubbles are consistent with the simulated helium concentrations. Moreover, the mean size of the helium bubbles increases with the increase of the irradiation temperatures and the helium fluence. The in-situ heating study performed in a transmission electron microscope indicates that the mean size of the helium bubbles increase slowly below 923 K and dramatically above 923 K. The coarsening mechanism of the helium bubbles in the alloy is suggested based on the study. - Highlights: • Helium bubble growth in zirconium with annealing was in-situ investigated in TEM. • The mean helium bubble size increase with helium fluence and annealing temperature. • Helium bubble size distribution is same as that of helium concentration by SRIM. • Mean bubble size increases slowly and quickly with temperature below and above 923 K. • The growth mechanism of the helium bubbles in Zr alloy has been discussed.

  5. A Masked Photocathode in Photoinjector

    SciTech Connect

    Qiang, Ji

    2010-12-14

    In this paper, we propose a masked photocathode inside the photoinjector for generating high brightness election beam. Instead of mounting the photocathode onto an electrode, an electrode with small hole is used as a mask to shield the photocathode from the accelerating vacuum chamber. Using such a masked photocathode will make the replacement of photocathode material easy by rotating the photocathode behind the electrode into the hole. Furthermore, this helps reduce the dark current or secondary electron emission from the photocathode material. The masked photocathode also provides transverse cut-off to a Gaussian laser beam that reduces electron beam emittance growth from nonlinear space-charge effects.

  6. Current status of NGL masks

    NASA Astrophysics Data System (ADS)

    Walker, David M.

    2000-07-01

    The manufacture of Next Generation Lithography reticles presents many challenges. Extremely small critical dimension and image placement error budgets; novel substrates including membranes and multi-layer reflective coatings; and inspection, detection and repair of subresolution defects will force revolutionary change in the infrastructure of mask technology. This paper surveys current NGL mask designs, structures, materials and manufacturing capabilities. Results from mask fabrication, physical modeling, error budget analysis and extensive experience in building X-Ray membrane masks are presented to develop process learning plans to meet future product specifications.

  7. Optical inspection of NGL masks

    NASA Astrophysics Data System (ADS)

    Pettibone, Donald W.; Stokowski, Stanley E.

    2004-12-01

    For the last five years KLA-Tencor and our joint venture partners have pursued a research program studying the ability of optical inspection tools to meet the inspection needs of possible NGL lithographies. The NGL technologies that we have studied include SCALPEL, PREVAIL, EUV lithography, and Step and Flash Imprint Lithography. We will discuss the sensitivity of the inspection tools and mask design factors that affect tool sensitivity. Most of the work has been directed towards EUV mask inspection and how to optimize the mask to facilitate inspection. Our partners have succeeded in making high contrast EUV masks ranging in contrast from 70% to 98%. Die to die and die to database inspection of EUV masks have been achieved with a sensitivity that is comparable to what can be achieved with conventional photomasks, approximately 80nm defect sensitivity. We have inspected SCALPEL masks successfully. We have found a limitation of optical inspection when applied to PREVAIL stencil masks. We have run inspections on SFIL masks in die to die, reflected light, in an effort to provide feedback to improve the masks. We have used a UV inspection system to inspect both unpatterned EUV substrates (no coatings) and blanks (with EUV multilayer coatings). These inspection results have proven useful in driving down the substrate and blank defect levels.

  8. Helium segregation on surfaces of plasma-exposed tungsten

    NASA Astrophysics Data System (ADS)

    Maroudas, Dimitrios; Blondel, Sophie; Hu, Lin; Hammond, Karl D.; Wirth, Brian D.

    2016-02-01

    We report a hierarchical multi-scale modeling study of implanted helium segregation on surfaces of tungsten, considered as a plasma facing component in nuclear fusion reactors. We employ a hierarchy of atomic-scale simulations based on a reliable interatomic interaction potential, including molecular-statics simulations to understand the origin of helium surface segregation, targeted molecular-dynamics (MD) simulations of near-surface cluster reactions, and large-scale MD simulations of implanted helium evolution in plasma-exposed tungsten. We find that small, mobile He n (1  ⩽  n  ⩽  7) clusters in the near-surface region are attracted to the surface due to an elastic interaction force that provides the thermodynamic driving force for surface segregation. This elastic interaction force induces drift fluxes of these mobile He n clusters, which increase substantially as the migrating clusters approach the surface, facilitating helium segregation on the surface. Moreover, the clusters’ drift toward the surface enables cluster reactions, most importantly trap mutation, in the near-surface region at rates much higher than in the bulk material. These near-surface cluster dynamics have significant effects on the surface morphology, near-surface defect structures, and the amount of helium retained in the material upon plasma exposure. We integrate the findings of such atomic-scale simulations into a properly parameterized and validated spatially dependent, continuum-scale reaction-diffusion cluster dynamics model, capable of predicting implanted helium evolution, surface segregation, and its near-surface effects in tungsten. This cluster-dynamics model sets the stage for development of fully atomistically informed coarse-grained models for computationally efficient simulation predictions of helium surface segregation, as well as helium retention and surface morphological evolution, toward optimal design of plasma facing components.

  9. Helium segregation on surfaces of plasma-exposed tungsten.

    PubMed

    Maroudas, Dimitrios; Blondel, Sophie; Hu, Lin; Hammond, Karl D; Wirth, Brian D

    2016-02-17

    We report a hierarchical multi-scale modeling study of implanted helium segregation on surfaces of tungsten, considered as a plasma facing component in nuclear fusion reactors. We employ a hierarchy of atomic-scale simulations based on a reliable interatomic interaction potential, including molecular-statics simulations to understand the origin of helium surface segregation, targeted molecular-dynamics (MD) simulations of near-surface cluster reactions, and large-scale MD simulations of implanted helium evolution in plasma-exposed tungsten. We find that small, mobile He n (1⩽  n  ⩽  7) clusters in the near-surface region are attracted to the surface due to an elastic interaction force that provides the thermodynamic driving force for surface segregation. This elastic interaction force induces drift fluxes of these mobile He n clusters, which increase substantially as the migrating clusters approach the surface, facilitating helium segregation on the surface. Moreover, the clusters' drift toward the surface enables cluster reactions, most importantly trap mutation, in the near-surface region at rates much higher than in the bulk material. These near-surface cluster dynamics have significant effects on the surface morphology, near-surface defect structures, and the amount of helium retained in the material upon plasma exposure. We integrate the findings of such atomic-scale simulations into a properly parameterized and validated spatially dependent, continuum-scale reaction-diffusion cluster dynamics model, capable of predicting implanted helium evolution, surface segregation, and its near-surface effects in tungsten. This cluster-dynamics model sets the stage for development of fully atomistically informed coarse-grained models for computationally efficient simulation predictions of helium surface segregation, as well as helium retention and surface morphological evolution, toward optimal design of plasma facing components. PMID:26794828

  10. Helium segregation on surfaces of plasma-exposed tungsten

    DOE PAGESBeta

    Maroudas, Dimitrios; Blondel, Sophie; Hu, Lin; Hammond, Karl D.; Wirth, Brian D.

    2016-01-21

    Here we report a hierarchical multi-scale modeling study of implanted helium segregation on surfaces of tungsten, considered as a plasma facing component in nuclear fusion reactors. We employ a hierarchy of atomic-scale simulations based on a reliable interatomic interaction potential, including molecular-statics simulations to understand the origin of helium surface segregation, targeted molecular-dynamics (MD) simulations of near-surface cluster reactions, and large-scale MD simulations of implanted helium evolution in plasma-exposed tungsten. We find that small, mobile He-n (1 <= n <= 7) clusters in the near-surface region are attracted to the surface due to an elastic interaction force that provides themore » thermodynamic driving force for surface segregation. Elastic interaction force induces drift fluxes of these mobile Hen clusters, which increase substantially as the migrating clusters approach the surface, facilitating helium segregation on the surface. Moreover, the clusters' drift toward the surface enables cluster reactions, most importantly trap mutation, in the near-surface region at rates much higher than in the bulk material. Moreover, these near-surface cluster dynamics have significant effects on the surface morphology, near-surface defect structures, and the amount of helium retained in the material upon plasma exposure. We integrate the findings of such atomic-scale simulations into a properly parameterized and validated spatially dependent, continuum-scale reaction-diffusion cluster dynamics model, capable of predicting implanted helium evolution, surface segregation, and its near-surface effects in tungsten. This cluster-dynamics model sets the stage for development of fully atomistically informed coarse-grained models for computationally efficient simulation predictions of helium surface segregation, as well as helium retention and surface morphological evolution, toward optimal design of plasma facing components.« less

  11. The implementation of Mask-Ed: reflections of academic participants.

    PubMed

    Reid-Searl, Kerry; Levett-Jones, Tracy; Cooper, Simon; Happell, Brenda

    2014-09-01

    This paper profiles the findings from a study that explored the perspectives and experiences of nurse educators who implemented a novel simulation approach termed Mask-Ed. The technique involves the educator wearing a silicone mask and or body parts and transforming into a character. The premise of this approach is that the masked educator has domain specific knowledge related to the simulation scenario and can transmit this to learners in a way that is engaging, realistic, spontaneous and humanistic. Nurse educators charged with the responsibility of implementing Mask-Ed in three universities were invited to participate in the study by attending an introductory workshop, implementing the technique and then journaling their experiences, insights and perspectives over a 12 month period. The journal entries were then thematically analysed. Key themes were categorised under the headings of Preparation, Implementation and Impact; Reflexivity and Responsiveness; Student Engagement and Ownership; and Teaching and Learning. Mask-Ed is a simulation approach which allows students to interact with the 'characters' in humanistic ways that promote person-centred care and therapeutic communication. This simulation approach holds previously untapped potential for a range of learning experiences, however, to be effective, adequate resourcing, training, preparation and practice is required. PMID:24906681

  12. What Is Being Masked in Object Substitution Masking?

    ERIC Educational Resources Information Center

    Gellatly, Angus; Pilling, Michael; Cole, Geoff; Skarratt, Paul

    2006-01-01

    Object substitution masking (OSM) is said to occur when a perceptual object is hypothesized that is mismatched by subsequent sensory evidence, leading to a new hypothesized object being substituted for the first. For example, when a brief target is accompanied by a longer lasting display of nonoverlapping mask elements, reporting of target…

  13. SEMATECH EUVL mask program status

    NASA Astrophysics Data System (ADS)

    Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

    2009-04-01

    As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been

  14. Masked Proportional Routing

    NASA Technical Reports Server (NTRS)

    Wolpert, David

    2004-01-01

    Masked proportional routing is an improved procedure for choosing links between adjacent nodes of a network for the purpose of transporting an entity from a source node ("A") to a destination node ("B"). The entity could be, for example, a physical object to be shipped, in which case the nodes would represent waypoints and the links would represent roads or other paths between waypoints. For another example, the entity could be a message or packet of data to be transmitted from A to B, in which case the nodes could be computer-controlled switching stations and the links could be communication channels between the stations. In yet another example, an entity could represent a workpiece while links and nodes could represent, respectively, manufacturing processes and stages in the progress of the workpiece towards a finished product. More generally, the nodes could represent states of an entity and the links could represent allowed transitions of the entity. The purpose of masked proportional routing and of related prior routing procedures is to schedule transitions of entities from their initial states ("A") to their final states ("B") in such a manner as to minimize a cost or to attain some other measure of optimality or efficiency. Masked proportional routing follows a distributed (in the sense of decentralized) approach to probabilistically or deterministically choosing the links. It was developed to satisfy a need for a routing procedure that 1. Does not always choose the same link(s), even for two instances characterized by identical estimated values of associated cost functions; 2. Enables a graceful transition from one set of links to another set of links as the circumstances of operation of the network change over time; 3. Is preferably amenable to separate optimization of different portions of the network; 4. Is preferably usable in a network in which some of the routing decisions are made by one or more other procedure(s); 5. Preferably does not cause an

  15. Combining Simultaneous with Temporal Masking

    ERIC Educational Resources Information Center

    Hermens, Frouke; Herzog, Michael H.; Francis, Gregory

    2009-01-01

    Simultaneous and temporal masking are two frequently used techniques in psychology and vision science. Although there are many studies and theories related to each masking technique, there are no systematic investigations of their mutual relationship, even though both techniques are often applied together. Here, the authors show that temporal…

  16. Masked Repetition Priming Using Magnetoencephalography

    ERIC Educational Resources Information Center

    Monahan, Philip J.; Fiorentino, Robert; Poeppel, David

    2008-01-01

    Masked priming is used in psycholinguistic studies to assess questions about lexical access and representation. We present two masked priming experiments using MEG. If the MEG signal elicited by words reflects specific aspects of lexical retrieval, then one expects to identify specific neural correlates of retrieval that are sensitive to priming.…

  17. Mask industry assessment trend analysis

    NASA Astrophysics Data System (ADS)

    Shelden, Gilbert; Marmillion, Patricia; Hughes, Greg

    2008-04-01

    Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. This year's survey data were presented in detail at BACUS and the detailed trend analysis presented at EMLC. The survey is designed with the input of semiconductor company mask technologists, merchant mask suppliers, and industry equipment makers. This year's assessment is the sixth in the current series of annual reports. With continued industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments on critical path issues. This year's survey is basically the same as the 2005 and 2006 surveys. Questions are grouped into eight categories: General Business Profile Information, Data Processing, Yields and Yield Loss, Mechanisms, Delivery Times, Returns and Services, Operating Cost Factors, and Equipment Utilization. Within each category is a multitude of questions that creates a detailed profile of both the business and technical status of the critical mask industry. Note: the questions covering operating cost factors and equipment utilization were added to the survey only in 2005; therefore, meaningful trend analysis is not available.

  18. Mask industry assessment trend analysis

    NASA Astrophysics Data System (ADS)

    Hughes, Greg; Yun, Henry

    2009-01-01

    Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH to gather information about the mask industry as an objective assessment of its overall condition. This year's survey data were presented in detail at BACUS and the detailed trend analysis presented at EMLC. The survey is designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the seventh in the current series of annual reports. With continued industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments on critical path issues. This year's survey is basically the same as the surveys in 2005 through 2007. Questions are grouped into seven categories: General Business Profile Information, Data Processing, Yields and Yield Loss, Mechanisms, Delivery Times, Returns, and Services. (Examples are given below). Within each category is a multitude of questions that creates a detailed profile of both the business and technical status of the critical mask industry.

  19. Advanced Mask Aligner Lithography (AMALITH)

    NASA Astrophysics Data System (ADS)

    Voelkel, Reinhard; Vogler, Uwe; Bramati, Arianna

    2015-03-01

    Mask aligner lithography is very attractive for less-critical lithography layers and is widely used for LED, display, CMOS image sensor, micro-fluidics and MEMS manufacturing. Mask aligner lithography is also a preferred choice the semiconductor back-end for 3D-IC, TSV interconnects, advanced packaging (AdP) and wafer-level-packaging (WLP). Mask aligner lithography is a mature technique based on shadow printing and has not much changed since the 1980s. In shadow printing lithography a geometric pattern is transferred by free-space propagation from a photomask to a photosensitive layer on a wafer. The inherent simplicity of the pattern transfer offers ease of operation, low maintenance, moderate capital expenditure, high wafers-per-hour (WPH) throughput, and attractive cost-of-ownership (COO). Advanced mask aligner lithography (AMALITH) comprises different measures to improve shadow printing lithography beyond current limits. The key enabling technology for AMALITH is a novel light integrator systems, referred to as MO Exposure Optics® (MOEO). MOEO allows to fully control and shape the properties of the illumination light in a mask aligner. Full control is the base for accurate simulation and optimization of the shadow printing process (computational lithography). Now photolithography enhancement techniques like customized illumination, optical proximity correction (OPC), phase masks (AAPSM), half-tone lithography and Talbot lithography could be used in mask aligner lithography. We summarize the recent progress in advanced mask aligner lithography (AMALITH) and discuss possible measures to further improve shadow printing lithography.

  20. Cochlear Implants.

    ERIC Educational Resources Information Center

    Clark, Catherine; Scott, Larry

    This brochure explains what a cochlear implant is, lists the types of individuals with deafness who may be helped by a cochlear implant, describes the process of evaluating people for cochlear implants, discusses the surgical process for implanting the aid, traces the path of sound through the cochlear implant to the brain, notes the costs of…

  1. Defect tolerant transmission lithography mask

    DOEpatents

    Vernon, Stephen P.

    2000-01-01

    A transmission lithography mask that utilizes a transparent substrate or a partially transparent membrane as the active region of the mask. A reflective single layer or multilayer coating is deposited on the membrane surface facing the illumination system. The coating is selectively patterned (removed) to form transmissive (bright) regions. Structural imperfections and defects in the coating have negligible effect on the aerial image of the mask master pattern since the coating is used to reflect radiation out of the entrance pupil of the imaging system. Similarly, structural imperfections in the clear regions of the membrane have little influence on the amplitude or phase of the transmitted electromagnetic fields. Since the mask "discards," rather than absorbs, unwanted radiation, it has reduced optical absorption and reduced thermal loading as compared to conventional designs. For EUV applications, the mask circumvents the phase defect problem, and is independent of the thermal load during exposure.

  2. Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance

    NASA Astrophysics Data System (ADS)

    Dietze, Uwe; Dress, Peter; Waehler, Tobias; Singh, Sherjang; Jonckheere, Rik; Baudemprez, Bart

    2011-03-01

    Extreme Ultraviolet Lithography (EUVL) is considered the leading lithography technology choice for semiconductor devices at 16nm HP node and beyond. However, before EUV Lithography can enter into High Volume Manufacturing (HVM) of advanced semiconductor devices, the ability to guarantee mask integrity at point-of-exposure must be established. Highly efficient, damage free mask cleaning plays a critical role during the mask manufacturing cycle and throughout the life of the mask, where the absence of a pellicle to protect the EUV mask increases the risk of contamination during storage, handling and use. In this paper, we will present effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance, which employs an intelligent, holistic approach to maximize Mean Time Between Cleans (MBTC) and extend the useful life span of the reticle. The data presented will demonstrate the protection of the capping and absorber layers, preservation of pattern integrity as well as optical and mechanical properties to avoid unpredictable CD-linewidth and overlay shifts. Experiments were performed on EUV blanks and pattern masks using various process conditions. Conditions showing high particle removal efficiency (PRE) and minimum surface layer impact were then selected for durability studies. Surface layer impact was evaluated over multiple cleaning cycles by means of UV reflectivity metrology XPS analysis and wafer prints. Experimental results were compared to computational models. Mask life time predictions where made using the same computational models. The paper will provide a generic overview of the cleaning sequence which yielded best results, but will also provide recommendations for an efficient in-fab mask maintenance scheme, addressing handling, storage, cleaning and inspection.

  3. Effect of using stencil masks made by focused ion beam milling on permalloy (Ni81Fe19) nanostructures.

    PubMed

    Bates, J R; Miyahara, Y; Burgess, J A J; Iglesias-Freire, O; Grütter, P

    2013-03-22

    Focused ion beam (FIB) milling is a common fabrication technique to make nanostencil masks which has the unintended consequence of gallium ion implantation surrounding milled features in silicon nitride membranes. We observe major changes in film structure, chemical composition, and magnetic behaviour of permalloy nanostructures deposited by electron beam evaporation using silicon nitride stencil masks made by a FIB as compared to stencil masks made by regular lithography techniques. We characterize the stenciled structures and both types of masks using transmission electron microscopy, electron energy loss spectroscopy, energy dispersive x-ray spectroscopy, magnetic force microscopy and kelvin probe force microscopy. All these techniques demonstrate distinct differences at a length scale of a 1-100 nm for the structures made using stencil mask fabricated using a FIB. The origin of these differences seems to be related to the presence of implanted ions, a detailed understanding of the mechanism however remains to be developed. PMID:23449320

  4. Bringing mask repair to the next level

    NASA Astrophysics Data System (ADS)

    Edinger, K.; Wolff, K.; Steigerwald, H.; Auth, N.; Spies, P.; Oster, J.; Schneider, H.; Budach, M.; Hofmann, T.; Waiblinger, M.

    2014-10-01

    Mask repair is an essential step in the mask manufacturing process as the extension of 193nm technology and the insertion of EUV are drivers for mask complexity and cost. The ability to repair all types of defects on all mask blank materials is crucial for the economic success of a mask shop operation. In the future mask repair is facing several challenges. The mask minimum features sizes are shrinking and require a higher resolution repair tool. At the same time mask blanks with different new mask materials are introduced to optimize optical performance and long term durability. For EUV masks new classes of defects like multilayer and phase defects are entering the stage. In order to achieve a high yield, mask repair has to cover etch and deposition capabilities and must not damage the mask. These challenges require sophisticated technologies to bring mask repair to the next level. For high end masks ion-beam based and e-based repair technologies are the obvious choice when it comes to the repair of small features. Both technologies have their pro and cons. The scope of this paper is to review and compare the performance of ion-beam based mask repair to e-beam based mask repair. We will analyze the limits of both technologies theoretically and experimentally and show mask repair related performance data. Based on this data, we will give an outlook to future mask repair tools.

  5. Sensitivity of coded mask telescopes.

    PubMed

    Skinner, Gerald K

    2008-05-20

    Simple formulas are often used to estimate the sensitivity of coded mask x-ray or gamma-ray telescopes, but these are strictly applicable only if a number of basic assumptions are met. Complications arise, for example, if a grid structure is used to support the mask elements, if the detector spatial resolution is not good enough to completely resolve all the detail in the shadow of the mask, or if any of a number of other simplifying conditions are not fulfilled. We derive more general expressions for the Poisson-noise-limited sensitivity of astronomical telescopes using the coded mask technique, noting explicitly in what circumstances they are applicable. The emphasis is on using nomenclature and techniques that result in simple and revealing results. Where no convenient expression is available a procedure is given that allows the calculation of the sensitivity. We consider certain aspects of the optimization of the design of a coded mask telescope and show that when the detector spatial resolution and the mask to detector separation are fixed, the best source location accuracy is obtained when the mask elements are equal in size to the detector pixels. PMID:18493279

  6. Masks for extreme ultraviolet lithography

    SciTech Connect

    Cardinale, G; Goldsmith, J; Kearney, P A; Larson, C; Moore, C E; Prisbrey, S; Tong, W; Vernon, S P; Weber, F; Yan, P-Y

    1998-09-01

    In extreme ultraviolet lithography (EUVL), the technology specific requirements on the mask are a direct consequence of the utilization of radiation in the spectral region between 10 and 15 nm. At these wavelengths, all condensed materials are highly absorbing and efficient radiation transport mandates the use of all-reflective optical systems. Reflectivity is achieved with resonant, wavelength-matched multilayer (ML) coatings on all of the optical surfaces - including the mask. The EUV mask has a unique architecture - it consists of a substrate with a highly reflective ML coating (the mask blank) that is subsequently over-coated with a patterned absorber layer (the mask). Particulate contamination on the EUVL mask surface, errors in absorber definition and defects in the ML coating all have the potential to print in the lithographic process. While highly developed technologies exist for repair of the absorber layer, no viable strategy for the repair of ML coating defects has been identified. In this paper the state-of-the-art in ML deposition technology, optical inspection of EUVL mask blank defects and candidate absorber patterning approaches are reviewed.

  7. Helium effects on creep properties of Fe-14CrWTi ODS steel at 650 °C

    NASA Astrophysics Data System (ADS)

    Chen, J.; Jung, P.; Rebac, T.; Duval, F.; Sauvage, T.; de Carlan, Y.; Barthe, M. F.

    2014-10-01

    In the present paper, the effects of helium on creep properties of Fe-14CrWTi ODS steel were studied by in-beam and post He-implantation creep tests. In-situ creep was performed in an in-beam creep device under uniaxial tensile stresses from 350 to 370 MPa during homogeneous helium implantation. Helium ions of energies varying from 0 to 25 MeV were implanted at a rate of 6 × 10-3 appm/s (corresponding to a displacement dose rate of 1.5 × 10-6 dpa/s). The average temperature was controlled to 650 °C within ±2 °C. In addition, post He-implantation creep tests were conducted at 650 °C as well. Subsequently, fracture surfaces and helium bubble evolution were studied in detail by SEM and TEM observations, respectively. Preliminary creep results show that helium slightly shortens the creep life time of ODS steel at 650 °C. Fracture surfaces of reference as well as implanted specimens, show areas with various grades of deformation. Areas of highest deformation can be interpreted as necking, while areas of low deformation show in helium implanted specimens a more granular structure. The results are discussed in terms of possible embrittlement of ODS steels by helium.

  8. Hg-Mask Coronagraph

    NASA Astrophysics Data System (ADS)

    Bourget, P.; Veiga, C. H.; Vieira Martins, R.; Assus, P.; Colas, F.

    In order to optimize the occulting process of a Lyot coronagraph and to provide a high dynamic range imaging, a new kind of occulting disk has been developed at the National Observatory of Rio de Janeiro. A mercury (Hg) drop glued onto an optical window by molecular cohesion and compressed by a pellicle film is used as the occulting disk. The minimum of the superficial tension potential function provides an optical precision (lambda/100) of the toric free surface of the mercury. This process provides a size control for the adaptation to the seeing conditions and to the apparent diameter of a resolved object, and in the case of adaptive optics, to the Airy diameter fraction needed. The occultation is a three dimensional process near the focal plane on the toric free surface that provides an apodization of the occultation. The Hg-Mask coronagraph has been projected for astrometric observations of faint satellites near to Jovian planets and works since 2000 at the 1.6 m telescope of the Pico dos Dias Observatory (OPD - Brazil).

  9. Gentle quantitative measurement of helium density in nanobubbles in silicon by spectrum imaging.

    PubMed

    Alix, Kévin; David, Marie-Laure; Lucas, Guillaume; Alexander, Duncan T L; Pailloux, Frédéric; Hébert, Cécile; Pizzagalli, Laurent

    2015-10-01

    We propose an original method for the determination of the physical properties of nanometer sized helium bubbles using spectrum imaging in an energy-filtered transmission electron microscope. Helium bubbles synthesized by high fluence implantation and thermal annealing in silicon are investigated. The acquisition parameters are determined to optimize both signal/noise ratio and time. The limitations to the extent of observable areas on a typical sample are explained. The necessary data correction and helium K-edge position measurement procedures are detailed and the accuracy of the method is discussed. Finally helium density maps are obtained and discussed. PMID:26093479

  10. Atomistic modeling of growth and coalescence of helium nano-bubbles in tungsten

    NASA Astrophysics Data System (ADS)

    Smirnov, R. D.; Krasheninnikov, S. I.; Guterl, J.

    2015-08-01

    The mechanisms of growth and coalescence of helium nano-bubbles in tungsten are investigated using molecular dynamics simulations. It is shown that crystal symmetries and governed by them properties of dislocations, generated by the growing nano-bubbles, are responsible for main nano-bubble features revealed, including non-spherical shape and anisotropy of surrounding stress field. The transport of helium atoms in non-uniform stress field is simulated at different temperatures and the transport coefficients are determined. The implications of the considered dislocation and helium dynamics on nucleation and growth of bubbles in tungsten with implanted helium are discussed.

  11. The Descending Helium Balloon

    ERIC Educational Resources Information Center

    Helseth, Lars Egil

    2014-01-01

    I describe a simple and fascinating experiment wherein helium leaks out of a rubber balloon, thereby causing it to descend. An estimate of the volumetric leakage rate is made by measuring its rate of descent.

  12. Mask materials for powder blasting

    NASA Astrophysics Data System (ADS)

    Wensink, Henk; Jansen, Henri V.; Berenschot, J. W.; Elwenspoek, Miko C.

    2000-06-01

    Powder blasting, or abrasive jet machining (AJM), is a technique in which a particle jet is directed towards a target for mechanical material removal. It is a fast, cheap and accurate directional etch technique for brittle materials such as glass, silicon and ceramics. The particle jet (which expands to about 1 cm in diameter) can be optimized for etching, while the mask defines the small and complex structures. The quality of the mask influences the performance of powder blasting. In this study we tested and compared several mask types and added a new one: electroplated copper. The latter combines a highly resistant mask material for powder blasting with the high-resolution capabilities of lithography, which makes it possible to obtain an accurate pattern transfer and small feature sizes (<50 µm).

  13. Mask technology for EUV lithography

    NASA Astrophysics Data System (ADS)

    Bujak, M.; Burkhart, Scott C.; Cerjan, Charles J.; Kearney, Patrick A.; Moore, Craig E.; Prisbrey, Shon T.; Sweeney, Donald W.; Tong, William M.; Vernon, Stephen P.; Walton, Christopher C.; Warrick, Abbie L.; Weber, Frank J.; Wedowski, Marco; Wilhelmsen, Karl C.; Bokor, Jeffrey; Jeong, Sungho; Cardinale, Gregory F.; Ray-Chaudhuri, Avijit K.; Stivers, Alan R.; Tejnil, Edita; Yan, Pei-yang; Hector, Scott D.; Nguyen, Khanh B.

    1999-04-01

    Extreme UV Lithography (EUVL) is one of the leading candidates for the next generation lithography, which will decrease critical feature size to below 100 nm within 5 years. EUVL uses 10-14 nm light as envisioned by the EUV Limited Liability Company, a consortium formed by Intel and supported by Motorola and AMD to perform R and D work at three national laboratories. Much work has already taken place, with the first prototypical cameras operational at 13.4 nm using low energy laser plasma EUV light sources to investigate issues including the source, camera, electro- mechanical and system issues, photoresists, and of course the masks. EUV lithograph masks are fundamentally different than conventional photolithographic masks as they are reflective instead of transmissive. EUV light at 13.4 nm is rapidly absorbed by most materials, thus all light transmission within the EUVL system from source to silicon wafer, including EUV reflected from the mask, is performed by multilayer mirrors in vacuum.

  14. Noncavitating Pump For Liquid Helium

    NASA Technical Reports Server (NTRS)

    Hasenbein, Robert; Izenson, Michael; Swift, Walter; Sixsmith, Herbert

    1996-01-01

    Immersion pump features high efficiency in cryogenic service. Simple and reliable centrifugal pump transfers liquid helium with mass-transfer efficiency of 99 percent. Liquid helium drawn into pump by helical inducer, which pressurizes helium slightly to prevent cavitation when liquid enters impeller. Impeller then pressurizes liquid. Purpose of pump to transfer liquid helium from supply to receiver vessel, or to provide liquid helium flow for testing and experimentation.

  15. Tensile behavior of helium charged VTiCrSi type alloys

    NASA Astrophysics Data System (ADS)

    Satou, M.; Koide, H.; Hasegawa, A.; Abe, K.; Kayano, H.; Matsui, H.

    1996-10-01

    Helium effect on the mechanical properties of the alloy V5Ti5Cr1SiAl,Y (nominal) was studied, adopting various helium charging methods and helium-to-dpa ratio. The first method was helium ion implantation using a cyclotron accelerator at Tohoku University, where helium and displacement levels were 50 appm and 0.02 dpa, respectively. The second, helium was charged by tritium trick technique and following neutron irradiation in FFTF/MOTA-2A, associated with about 80 appm He and 43 dpa. The third was dynamic helium charging experiment (DHCE) conducted in FFTF/MOTA-2B, where helium was generated within specimens during neutron irradiation by tritium decay, and the helium-to-dpa ratio was adjusted to simulate the fusion reactor condition, that is, 177 appm He and 24 dpa. The effect of helium on tensile properties of the VTiCrSiAl,Y alloy depended on the helium charging methods. The uniform elongation of the alloy was 3.2% and total elongation was 8.3% at DHCE condition, which was the most fusion relevant condition of the methods. It is important that tensile properties of the present alloy could be acceptable for fusion reactor component materials.

  16. Cosmic Masks Still Dance

    NASA Astrophysics Data System (ADS)

    Block, David L.; Puerari, Ivânio; Frogel, Jay A.; Eskridge, Paul B.; Stockton, Alan; Fuchs, Burkhard

    The Hubble classification scheme of galaxies is based on their optical appearance or `masks'. As one goes from early to late type spirals, both barred and unbarred, the optical appearance will be dominated more and more by the young Population I, i.e., blue stars and dust. Atlases reveal the rich variety of responses of the Population I component of gas and dust (the mask) to the underlying, older, stellar population. However, the gaseous Population I component, may only constitute 5 percent of the dynamical mass of the galaxy. Masks of negligible mass may conceal the human face - and that of galaxy. In the near-infrared, the morphology of older star-dominated disk indicates a simple classification scheme: the dominant Fourier m-mode in the dust penetrated regime, and the associated pitch angle. A ubiquity of low m=1 and m=2 modes is confirmed. On the basis of deprojected H (1.65 μm) and K' (2.1μm) images, we propose that the evolved stellar disks may be grouped into three principal dust penetrated archetypes: those with tightly wound stellar arms characterised by pitch angles at K' of ~ 10^° (the α class), an intermediate group with pitch angles of ~ 25^° (the β class) and thirdly, those with open spirals demarcated by pitch angles at K' of ~ 40^° (the γ bin). Flat or falling rotation curves give rise to the tightly wound α class; rising rotation curves are associated with the open γ class. The observed dust penetrated classes are inextricably related to the rate of shear in the stellar disk, as determined by A/ω. Here A is the first Oort constant andω denotes the angular velocity. There is no correlation between our dust penetrated classes and optical Hubble binning; the Hubble tuning fork does not constrain the morphology of the old stellar Population II disks. NGC 3223 and NGC 7083 (both SbI-II and almost the same absolute blue magnitude) have identical Hubble types and identical luminosity classes; the dust penetrated disk of NGC 3223 has tightly

  17. Visual Masking During Pursuit Eye Movements

    ERIC Educational Resources Information Center

    White, Charles W.

    1976-01-01

    Visual masking occurs when one stimulus interferes with the perception of another stimulus. Investigates which matters more for visual masking--that the target and masking stimuli are flashed on the same part of the retina, or, that the target and mask appear in the same place. (Author/RK)

  18. A quantitative μNRA study of helium intergranular and volume diffusion in sintered UO 2

    NASA Astrophysics Data System (ADS)

    Martin, G.; Desgardin, P.; Sauvage, T.; Garcia, P.; Carlot, G.; Khodja, H.; Barthe, M. F.

    2006-08-01

    To understand the mechanisms related to helium migration in nuclear oxide fuels, 3He was implanted at 2 × 1016 at. cm-2 in UO2 sintered disks. The samples were then annealed at temperatures ranging between 800 °C and 1300 °C. Changes in helium concentrations were investigated using two nuclear reaction analysis techniques based on the 3He(d, α)1H reaction. The first technique uses a macrobeam in order to measure helium depth profiles averaged over a 500 × 500 μm2 area. The second technique uses a microbeam and provides a quantitative two-dimensional helium concentration cartography, for which each pixel corresponds to a depth integrated helium signal. The analysed zones were optically characterised which enabled a detailed analysis of the impact of the material microstructure on helium release from the samples, with an emphasis on the study of grain boundary effects.

  19. Generating mask inspection rules for advanced lithography

    NASA Astrophysics Data System (ADS)

    Badger, Karen; Broadbent, Bill; Dayal, Aditya; Gallagher, Emily; Hsiang, ChingYun; Redding, Vincent

    2005-11-01

    Semiconductor product designs are necessarily constrained by both the wafer and mask lithographic capabilities. When mask image sizes approach the exposure wavelength, optical and resist effects distort the printed images. Applying optical proximity correction (OPC) to design features on the mask compensates for diffraction effects. However, aggressive OPC introduces even smaller minimum features, adds notches and bulges, introduces sub-resolution assist features (SRAFs) and generally creates a more challenging mask design with respect to data handling, printing and inspection. Mask defect inspection is a critical part of the mask process, ensuring that the mask pattern matches the intended design. However, the inspection itself imposes constraints on mask patterns that can be inspected with high defect sensitivity but low nuisance defect counts. These additional restrictions are undesirable since they can reduce the effectiveness of the OPC. IBM and KLA-Tencor have developed a test mask methodology to investigate the inspectability limits of the 576 and 516 mask inspection systems. The test mask design contains a variety of rules or features that currently impose inspectability limits on the inspection tools, in a range of sizes. The design also incorporates many features essential for obtaining valid results, such as a user-friendly layout, multiple pattern orientations, and background patterns. The mask was built and inspected in IBM Burlington's mask house. Preliminary inspection results will be presented; they underscore the importance of understanding both the inspection tool and the mask process when restricting mask design rules.

  20. Rewritable photochromic focal plane masks

    NASA Astrophysics Data System (ADS)

    Molinari, Emilio; Bertarelli, Chiara; Bianco, Andrea; Bortoletto, Fabio; Conconi, Paolo; Crimi, Giuseppe; Gallazzi, Maria C.; Giro, Enrico; Lucotti, Andrea; Pernechele, Claudio; Zerbi, Filippo M.; Zerbi, Giuseppe

    2003-02-01

    The application of organic photochromic materials in astronomy is opening new possibilities which we are investigating in order to design innovative devices for future instrumentation. The photochromic property of transparent/opaque transition (although in a limited wavelength range) and the changes in intrinsic refractive index have led our studies to application in astronomic spectrographs, both as focal plane mask (for MOS application) and as dispersive elements (volume phase holographic gratings, VPHG), respectively. In both cases the possibility to write and erase devices with suitable irradiation has revealed a new perspective for non-disposable and fully customizable items for spectroscopy. Pursuing this goal we have synthesized a series of novel photochromic materials belonging to the diarylethenes. They fulfill the requirements of thermal stability and fatigue resistance necessary to build functional devices. Prototypes of high contrast focal plane mask working in the H-alpha spectral region have been manufactured and characterized both in laboratory and with the AFOSC camera at Asiago telescope (1.8 m). A custom writing robot (ARATRO) which, taking imaging frames and with the aid of interactive mask design software and ad hoc control electronics, is able to write MOS masks, has been constructed. The design of the MOS masks allow the fitting in the AFOSC slit wheel. The overall set-up is ready for the sky tests.

  1. Nanofabrication on unconventional substrates using transferred hard masks

    NASA Astrophysics Data System (ADS)

    Li, Luozhou; Bayn, Igal; Lu, Ming; Nam, Chang-Yong; Schröder, Tim; Stein, Aaron; Harris, Nicholas C.; Englund, Dirk

    2015-01-01

    A major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based on re-usable silicon membrane hard masks, patterned using standard lithography and mature silicon processing technology. These masks, transferred precisely onto targeted regions, can be in the millimetre scale. They allow for fabrication on a wide range of substrates, including rough, soft, and non-conductive materials, enabling feature linewidths down to 10 nm. Plasma etching, lift-off, and ion implantation are realized without the need for scanning electron/ion beam processing, UV exposure, or wet etching on target substrates.

  2. Nanofabrication on unconventional substrates using transferred hard masks

    SciTech Connect

    Li, Luozhou; Bayn, Igal; Lu, Ming; Nam, Chang -Yong; Schroder, Tim; Stein, Aaron; Harris, Nicholas C.; Englund, Dirk

    2015-01-15

    Here, a major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based on re-usable silicon membrane hard masks, patterned using standard lithography and mature silicon processing technology. These masks, transferred precisely onto targeted regions, can be in the millimetre scale. They allow for fabrication on a wide range of substrates, including rough, soft, and non-conductive materials, enabling feature linewidths down to 10 nm. Plasma etching, lift-off, and ion implantation are realized without the need for scanning electron/ion beam processing, UV exposure, or wet etching on target substrates.

  3. Nanofabrication on unconventional substrates using transferred hard masks

    PubMed Central

    Li, Luozhou; Bayn, Igal; Lu, Ming; Nam, Chang-Yong; Schröder, Tim; Stein, Aaron; Harris, Nicholas C.; Englund, Dirk

    2015-01-01

    A major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based on re-usable silicon membrane hard masks, patterned using standard lithography and mature silicon processing technology. These masks, transferred precisely onto targeted regions, can be in the millimetre scale. They allow for fabrication on a wide range of substrates, including rough, soft, and non-conductive materials, enabling feature linewidths down to 10 nm. Plasma etching, lift-off, and ion implantation are realized without the need for scanning electron/ion beam processing, UV exposure, or wet etching on target substrates. PMID:25588550

  4. Coatings on reflective mask substrates

    DOEpatents

    Tong, William Man-Wai; Taylor, John S.; Hector, Scott D.; Mangat, Pawitter J. S.; Stivers, Alan R.; Kofron, Patrick G.; Thompson, Matthew A.

    2002-01-01

    A process for creating a mask substrate involving depositing: 1) a coating on one or both sides of a low thermal expansion material EUVL mask substrate to improve defect inspection, surface finishing, and defect levels; and 2) a high dielectric coating, on the backside to facilitate electrostatic chucking and to correct for any bowing caused by the stress imbalance imparted by either other deposited coatings or the multilayer coating of the mask substrate. An film, such as TaSi, may be deposited on the front side and/or back of the low thermal expansion material before the material coating to balance the stress. The low thermal expansion material with a silicon overlayer and a silicon and/or other conductive underlayer enables improved defect inspection and stress balancing.

  5. Deciphering gas implantation rate effects on bubble nucleation in tungsten

    NASA Astrophysics Data System (ADS)

    Yang, Zhangcan; Wirth, Brian

    2015-11-01

    We use the object kinetic Monte Carlo code KSOME to study the sub-surface helium clustering behaviour in tungsten at various conditions relevant to plasma exposure of divertor surfaces. In particular, we have investigated helium implantation fluxes from 1020 to 1027 m-2s-1 at temperatures from 400K to 1600K for 100-eV helium ions implanted below tungsten surfaces as a function of pre-existing vacancy concentration. For these conditions, the helium retention rate, the surface areal density of adatoms, and the number density of clusters are analysed. A phase diagram is constructed to summarize the results, which maps the ratio of self-trapped helium to vacancy-trapped helium with respect to the helium flux, the target temperature, and the concentration of pre-existing vacancy. According to the phase diagram, the boundary between the self-trapping dominant regime and the vacancy-trapping dominant regime can be distinguished. In general, pre-existing vacancies are dominant in trapping helium atoms for low fluxes and high temperatures, while self-trapping is dominant for high fluxes. These results provide important insight into the mechanisms of helium clustering for plasma facing components in fusion reactors.

  6. Accurate mask model for advanced nodes

    NASA Astrophysics Data System (ADS)

    Zine El Abidine, Nacer; Sundermann, Frank; Yesilada, Emek; Ndiaye, El Hadji Omar; Mishra, Kushlendra; Paninjath, Sankaranarayanan; Bork, Ingo; Buck, Peter; Toublan, Olivier; Schanen, Isabelle

    2014-07-01

    Standard OPC models consist of a physical optical model and an empirical resist model. The resist model compensates the optical model imprecision on top of modeling resist development. The optical model imprecision may result from mask topography effects and real mask information including mask ebeam writing and mask process contributions. For advanced technology nodes, significant progress has been made to model mask topography to improve optical model accuracy. However, mask information is difficult to decorrelate from standard OPC model. Our goal is to establish an accurate mask model through a dedicated calibration exercise. In this paper, we present a flow to calibrate an accurate mask enabling its implementation. The study covers the different effects that should be embedded in the mask model as well as the experiment required to model them.

  7. Helium-Charged La-Ni-Al Thin Films Deposited by Magnetron Sputtering

    SciTech Connect

    Shi Liqun; Chen Deming; Xu Shilin; Liu Chaozhu; Hao Wanli; Zhou Zhuyin

    2005-07-15

    An advanced implantation of low energy helium-4 atoms during the La-Ni-Al film growth by adopting magnetron sputtering with Ar/He mixture gases is discussed. Both proton backscattering spectroscopy (PBS) and elastic recoil detection (ERD) analyses were adopted to measure helium concentration of the films and distribution in the near-surface region. Helium atoms with a high concentration incorporate evenly in deposited film. The introduction of the helium with no extra irradiation damage is expected by choosing suitable deposition conditions. It was found that amorphous and crystalline LaNi{sub 5}-type structures can be achieved when sputtered with pure Ar and Ar/He mixture gases at room temperature, respectively. Thermal desorption experiments proposes that a part of hydrogen atoms are bound to trapped helium at crystal and releases together with helium. Only a small fraction of helium is released from the helium-vacancy clusters in lower temperature range and most of helium is released from small size helium bubbles in the high temperature range.

  8. Informational masking and musical training

    NASA Astrophysics Data System (ADS)

    Oxenham, Andrew J.; Fligor, Brian J.; Mason, Christine R.; Kidd, Gerald

    2003-09-01

    The relationship between musical training and informational masking was studied for 24 young adult listeners with normal hearing. The listeners were divided into two groups based on musical training. In one group, the listeners had little or no musical training; the other group was comprised of highly trained, currently active musicians. The hypothesis was that musicians may be less susceptible to informational masking, which is thought to reflect central, rather than peripheral, limitations on the processing of sound. Masked thresholds were measured in two conditions, similar to those used by Kidd et al. [J. Acoust. Soc. Am. 95, 3475-3480 (1994)]. In both conditions the signal was comprised of a series of repeated tone bursts at 1 kHz. The masker was comprised of a series of multitone bursts, gated with the signal. In one condition the frequencies of the masker were selected randomly for each burst; in the other condition the masker frequencies were selected randomly for the first burst of each interval and then remained constant throughout the interval. The difference in thresholds between the two conditions was taken as a measure of informational masking. Frequency selectivity, using the notched-noise method, was also estimated in the two groups. The results showed no difference in frequency selectivity between the two groups, but showed a large and significant difference in the amount of informational masking between musically trained and untrained listeners. This informational masking task, which requires no knowledge specific to musical training (such as note or interval names) and is generally not susceptible to systematic short- or medium-term training effects, may provide a basis for further studies of analytic listening abilities in different populations.

  9. Psychometric functions for informational masking

    NASA Astrophysics Data System (ADS)

    Lutfi, Robert A.; Kistler, Doris J.; Callahan, Michael R.; Wightman, Frederic L.

    2003-12-01

    The term informational masking has traditionally been used to refer to elevations in signal threshold resulting from masker uncertainty. In the present study, the method of constant stimuli was used to obtain complete psychometric functions (PFs) from 44 normal-hearing listeners in conditions known to produce varying amounts of informational masking. The listener's task was to detect a pure-tone signal in the presence of a broadband noise masker (low masker uncertainty) and in the presence of multitone maskers with frequencies and amplitudes that varied at random from one presentation to the next (high masker uncertainty). Relative to the broadband noise condition, significant reductions were observed in both the slope and the upper asymptote of the PF for multitone maskers producing large amounts of informational masking. Slope was affected more for some listeners and conditions while asymptote was affected more for others; consequently, neither parameter alone was highly predictive of individual thresholds or the amount of informational masking. Mean slopes and asymptotes varied nonmonotonically with the number of masker components in a manner similar to mean thresholds, particularly when the estimated effect of energetic masking on thresholds was subtracted out. As in past studies, the threshold data were well described by a model in which trial-by-trial judgments are based on a weighted sum of levels in dB at the output of independent auditory filters. The psychometric data, however, complicated the model's interpretation in two ways: First, they suggested that, depending on the listener and condition, the weights can either reflect a fixed influence of masker components on each trial or the effect of occasionally mistaking a masker component for the signal from trial to trial. Second, they indicated that in either case the variance of the underlying decision variable as estimated from PF slope is not by itself great enough to account for the observed changes

  10. Helium-refrigeration system

    SciTech Connect

    Specht, J.R.; Millar, B.; Sutherland, A.

    1995-08-01

    The design, procurement, and preliminary construction was completed for adding two more wet expansion engines to two helium refrigerators. These will be added in mid-year FY 1995. In addition a variable speed drive will be added to an existing helium compressor. This is part of an energy conservation upgrade project to reduce operating costs from the use of electricity and liquid nitrogen. This project involves the replacement of Joule-Thompson valves in the refrigerators with expansion engines resulting in system efficiency improvements of about 30% and improved system reliability.

  11. Is solid helium a supersolid?

    SciTech Connect

    Hallock, Robert

    2015-05-15

    Recent experiments suggest that helium-4 atoms can flow through an experimental cell filled with solid helium. But that incompletely understood flow is quite different from the reported superfluid-like motion that so excited physicists a decade ago.

  12. Self-masking subtraction tomosynthesis

    SciTech Connect

    Chakraborty, D.P.; Yester, M.V.; Barnes, G.T.; Lakshminarayanan, A.V.

    1984-01-01

    The authors tested the image quality and dose savings of self-masking subtraction tomosynthesis (SST), which combines digital tomosynthesis with subtraction of a blurred self-mask. High-quality images of the inner ear of a head phantom were obtained at moderate dose savings. Although they were taken with linear motion, they did not exhibit the streaking due to off-fulcrum objects that is characteristic of conventional linear tomography. SST could reduce patient dose by a factor of at least 12 in examinations of the inner ear, and the mechanical aspects can be implemented with moderate modifications of existing instrumentation.

  13. Cochlear Implants

    MedlinePlus

    ... electrodes are inserted. The electronic device at the base of the electrode array is then placed under ... FDA approval for implants The Food and Drug Administration (FDA) regulates cochlear implant devices for both adults ...

  14. Goserelin Implant

    MedlinePlus

    Goserelin implant is used in combination with radiation therapy and other medications to treat localized prostate cancer and is ... treatment of abnormal bleeding of the uterus. Goserelin implant is in a class of medications called gonadotropin- ...

  15. Cochlear Implants

    MedlinePlus

    A cochlear implant is a small, complex electronic device that can help to provide a sense of sound. People who are ... of-hearing can get help from them. The implant consists of two parts. One part sits on ...

  16. Carmustine Implant

    MedlinePlus

    Carmustine implant is used along with surgery and sometimes radiation therapy to treat malignant glioma (a certain type of ... Carmustine implant comes as a small wafer that is placed in the brain by a doctor during surgery to ...

  17. Cochlear implant

    MedlinePlus

    ... antenna. This part of the implant receives the sound, converts the sound into an electrical signal, and sends it to ... implants allow deaf people to receive and process sounds and speech. However, these devices do not restore ...

  18. Breast Implants

    MedlinePlus

    ... Updated Safety Information (Consumer Article) FDA Provides Updated Safety Data on Silicone Gel-Filled Breast Implants (Press Announcement) [ARCHIVED] Breast Implant Guidance for Industry (2006) Post Approval Studies Webpage Freedom of Information ...

  19. The Kaonic Helium Case

    NASA Astrophysics Data System (ADS)

    Curceanu (Petrascu), C.; Bragadireanu, A. M.; Curceanu (Petrascu), C.; Ghio, F.; Girolami, B.; Guaraldo, C.; Iliescu, M.; Levi Sandri, P.; Lucherini, V.; Sirghi, D. L.; Sirghi, F.; Cargnelli, M.; Fuhrmann, H.; Ishiwatari, T.; Kienle, P.; Marton, J.; Zmeskal, J.; Fiorini, C.; Longoni, A.; Frizzi, T.; Itahashi, K.; Iwasaki, M.; Koike, T.; Ponta, T.; Soltau, H.; Lechner, P.; Struder, L.

    2005-12-01

    The only three existent kaonic helium X-ray transition measurements at present are referring to the transitions to 2p level. These measurements are more than 30 years old and the obtained results, affected by big errors, are much larger than those predicted by optical models. It is thought that the optical model is inadequate, due to the presence of the ∧(1405) resonance, not properly taken into account. Because the nucleons in the helium nucleus are tightly bound, the effective energy of the K-p interaction (1432 MeV at threshold) is in helium much closer to the energy of the resonance than in other nuclei. It is then planned to measure the kaonic helium X-ray transitions to the 2p level in the framework of the SIDDHARTA (SIlicon Drift Detector for Hadronic Atom Research by Timing Application) experiment, at the DAΦNE collider of Frascati National Laboratories, and to confirm or not the discrepancy reported by the previous experiments with a much smaller error.

  20. On Helium Anions in Helium Droplets: Interpreting Recent Experiments

    NASA Astrophysics Data System (ADS)

    Mauracher, Andreas; Huber, Stefan E.

    2014-10-01

    Helium droplets provide an ideal environment to study elementary processes in atomic systems at very low temperatures. Here, we discuss properties of charged and neutral, atomic and molecular helium species formed in helium droplets upon electron impact. By studying their interaction with atomic ground state helium we find that He, He2 and excited (metastable) He*- are well bound within the helium droplet. In comparison, He* , He2* and He2* are found to be squeezed out due to energetic reasons. We also present the formation pathways of atomic and molecular helium anions in helium droplets. Transition barriers in the energetic lowest He*- - He interaction potentials prevent molecule formation at the extremely low temperatures in helium droplets. In contrast, some excited states allow a barrier-free formation of molecular helium (anions). With these theoretical results at hand we can interpret recent experiments in which the resonant formation of atomic and molecular helium anions was observed. Furthermore, we give an outlook on the implications of the presence of these anionic species in doped helium droplets with regard to charge transfer reactions. Austrian Fund Agency (FWF, I 978-N20, DK+ project Computational Interdisciplinary Modelling W1227-N16)/Austrian Ministry of Science (BMWF, Konjunkturpaket II, UniInfrastrukturprogramm of the Focal Point Scientific Computing).

  1. Cost-effective mask-sharing technology for SOI LIGBT and PLDMOS

    NASA Astrophysics Data System (ADS)

    Huang, Yong; Qiao, Ming; Zhou, Xin; Liang, Tao; Li, Yang; Li, Zhaoji; Zhang, Bo

    2016-04-01

    Cost-effective mask-sharing technology for the 200 V silicon-on-insulator (SOI) lateral insulated gate bipolar transistor (LIGBT) and p-channel lateral double-diffused MOS (PLDMOS) are proposed in this paper. N-well and P-body implantations are shared as an N-buffer implantation of the LIGBT and P-buffer implantation of the PLDMOS, respectively, which reduces two masks compared with the conventional process. The structure and process parameters for LIGBT and PLDMOS with the new process are optimized by simulation to achieve good performance. The experimental results indicate that the LIGBT and PLDMOS using the new process maintain the same performance compared to the conventional devices.

  2. Multiple-mask chemical etching

    NASA Technical Reports Server (NTRS)

    Cannon, D. L.

    1969-01-01

    Multiple masking techniques use lateral etching to reduce the total area of the high etch-rate oxide exposed to the chemical etchant. One method uses a short-term etch to remove the top layer from the silicon oxide surface, another acts before the top layer is grown.

  3. Factors affecting speech understanding in gated interference: Cochlear implant users and normal-hearing listeners

    NASA Astrophysics Data System (ADS)

    Nelson, Peggy B.; Jin, Su-Hyun

    2004-05-01

    Previous work [Nelson, Jin, Carney, and Nelson (2003), J. Acoust. Soc. Am 113, 961-968] suggested that cochlear implant users do not benefit from masking release when listening in modulated noise. The previous findings indicated that implant users experience little to no release from masking when identifying sentences in speech-shaped noise, regardless of the modulation frequency applied to the noise. The lack of masking release occurred for all implant subjects who were using three different devices and speech processing strategies. In the present study, possible causes of this reduced masking release in implant listeners were investigated. Normal-hearing listeners, implant users, and normal-hearing listeners presented with a four-band simulation of a cochlear implant were tested for their understanding of sentences in gated noise (1-32 Hz gate frequencies) when the duty cycle of the noise was varied from 25% to 75%. No systematic effect of noise duty cycle on implant and simulation listeners' performance was noted, indicating that the masking caused by gated noise is not only energetic masking. Masking release significantly increased when the number of spectral channels was increased from 4 to 12 for simulation listeners, suggesting that spectral resolution is important for masking release. Listeners were also tested for their understanding of gated sentences (sentences in quiet interrupted by periods of silence ranging from 1 to 32 Hz as a measure of auditory fusion, or the ability to integrate speech across temporal gaps. Implant and simulation listeners had significant difficulty understanding gated sentences at every gate frequency. When the number of spectral channels was increased for simulation listeners, their ability to understand gated sentences improved significantly. Findings suggest that implant listeners' difficulty understanding speech in modulated conditions is related to at least two (possibly related) factors: degraded spectral information and

  4. "The Mask Who Wasn't There": Visual Masking Effect with the Perceptual Absence of the Mask

    ERIC Educational Resources Information Center

    Rey, Amandine Eve; Riou, Benoit; Muller, Dominique; Dabic, Stéphanie; Versace, Rémy

    2015-01-01

    Does a visual mask need to be perceptually present to disrupt processing? In the present research, we proposed to explore the link between perceptual and memory mechanisms by demonstrating that a typical sensory phenomenon (visual masking) can be replicated at a memory level. Experiment 1 highlighted an interference effect of a visual mask on the…

  5. Helium anion formation inside helium droplets

    NASA Astrophysics Data System (ADS)

    Jabbour Al Maalouf, Elias; Reitshammer, Julia; Ribar, Anita; Scheier, Paul; Denifl, Stephan

    2016-07-01

    The formation of He∗- is examined with improved electron energy resolution of about 100 meV utilizing a hemispherical electron monochromator. The work presented provides a precise determination of the three previously determined resonance peak positions that significantly contribute to the formation of He∗- inside helium nanodroplets in the energy range from 20 eV to 29.5 eV. In addition, a new feature is identified located at 27.69 ± 0.18 eV that we assign to the presence of O2 as a dopant inside the droplet. With increasing droplet size a small blue shift of the resonance positions is observed. Also for the relatively low electron currents used in the present study (i.e., 15-70 nA) a quadratic dependence of the He∗- ion yield on the electron current is observed.

  6. Physiological functioning of the ear and masking

    NASA Technical Reports Server (NTRS)

    1984-01-01

    The physiological functions of the ear and the role masking plays in speech communication are examined. Topics under investigation include sound analysis of the ear, the aural reflex, and various types of noise masking.

  7. Effect of a high helium content on the flow and fracture properties of a 9Cr martensitic steel

    NASA Astrophysics Data System (ADS)

    Henry, J.; Vincent, L.; Averty, X.; Marini, B.; Jung, P.

    2007-08-01

    An experimental characterization was conducted of helium effects on the mechanical properties of a 9Cr martensitic steel. Six sub-size Charpy samples were implanted in the notch region at 250 °C with 0.25 at.% helium and subsequently tested in 3-point bending at room temperature. Brittle fracture mode (cleavage and intergranular fracture) was systematically observed in the implanted zones of the samples. Finite element calculations of the tests, using as input the tensile properties measured on a helium loaded sample, were performed in order to determine the fracture stress at the onset of brittle crack propagation. Preliminary TEM investigations of the implantation-induced microstructure revealed a high density of small helium bubbles.

  8. IBA studies of helium mobility in nuclear materials revisited

    NASA Astrophysics Data System (ADS)

    Trocellier, P.; Agarwal, S.; Miro, S.; Vaubaillon, S.; Leprêtre, F.; Serruys, Y.

    2015-12-01

    The aim of this paper is to point out and to discuss some features extracted from the study of helium migration in nuclear materials performed during the last fifteen years using ion beam analysis (IBA) measurements. The first part of this paper is devoted to a brief description of the two main IBA methods used, i.e. deuteron induced nuclear reaction for 3He depth profiling and high-energy heavy-ion induced elastic recoil detection analysis for 4He measurement. In the second part, we provide an overview of the different studies carried out on model nuclear waste matrices and model nuclear reactor structure materials in order to illustrate and discuss specific results in terms of key influence parameters in relation with thermal or radiation activated migration of helium. Finally, we show that among the key parameters we have investigated as able to influence the height of the helium migration barrier, the following can be considered as pertinent: the experimental conditions used to introduce helium (implanted ion energy and implantation fluence), the grain size of the matrix, the lattice cell volume, the Young's modulus, the ionicity degree of the chemical bond between the transition metal atom M and the non-metal atom X, and the width of the band gap.

  9. Method for mask repair using defect compensation

    DOEpatents

    Sweeney, Donald W.; Ray-Chaudhuri, Avijit K.

    2001-01-01

    A method for repair of amplitude and/or phase defects in lithographic masks. The method involves modifying or altering a portion of the absorber pattern on the surface of the mask blank proximate to the mask defect to compensate for the local disturbance (amplitude or phase) of the optical field due to the defect.

  10. 21 CFR 868.5580 - Oxygen mask.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 8 2014-04-01 2014-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and... ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device placed over a patient's nose, mouth, or tracheostomy to administer oxygen or aerosols. (b)...

  11. 21 CFR 868.5580 - Oxygen mask.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and... ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device placed over a patient's nose, mouth, or tracheostomy to administer oxygen or aerosols. (b)...

  12. 21 CFR 868.5580 - Oxygen mask.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and... ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device placed over a patient's nose, mouth, or tracheostomy to administer oxygen or aerosols. (b)...

  13. 21 CFR 868.5580 - Oxygen mask.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and... ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device placed over a patient's nose, mouth, or tracheostomy to administer oxygen or aerosols. (b)...

  14. 21 CFR 868.5580 - Oxygen mask.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 8 2012-04-01 2012-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and... ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device placed over a patient's nose, mouth, or tracheostomy to administer oxygen or aerosols. (b)...

  15. 47 CFR 90.210 - Emission masks.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... operating in the frequency bands governed under this part. Applicable Emission Masks Frequency band(MHz) Mask for equipment with Audio low passfilter Mask for equipment without audio low pass filter Below 25... the output power (P in watts) of the transmitter as follows: (1) On any frequency removed from...

  16. 47 CFR 90.210 - Emission masks.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... operating under this part. Applicable Emission Masks Frequency band (MHz) Mask for equipmentwith audio low pass filter Mask for equipmentwithout audio low pass filter Below 25 1 A or B A or C 25-50 B C 72-76 B... watts) of the transmitter as follows: (1) On any frequency removed from the assigned frequency by...

  17. 47 CFR 90.210 - Emission masks.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... operating in the frequency bands governed under this part. Applicable Emission Masks Frequency band(MHz) Mask for equipment with Audio low passfilter Mask for equipment without audio low pass filter Below 25... the output power (P in watts) of the transmitter as follows: (1) On any frequency removed from...

  18. 47 CFR 90.210 - Emission masks.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... operating under this part. Applicable Emission Masks Frequency band (MHz) Mask for equipmentwith audio low pass filter Mask for equipmentwithout audio low pass filter Below 25 1 A or B A or C 25-50 B C 72-76 B... watts) of the transmitter as follows: (1) On any frequency removed from the assigned frequency by...

  19. 21 CFR 868.5600 - Venturi mask.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is...

  20. 21 CFR 868.5600 - Venturi mask.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 8 2014-04-01 2014-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is...

  1. 21 CFR 868.5600 - Venturi mask.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is...

  2. 21 CFR 868.5600 - Venturi mask.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is...

  3. 21 CFR 868.5600 - Venturi mask.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 8 2012-04-01 2012-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is...

  4. Masks: Escape to/from Reality.

    ERIC Educational Resources Information Center

    Kavett, Hyman

    1981-01-01

    Explains the significance of masks in ethnographic and cultural research and suggests 24 activities intended for use by social studies classroom teachers as they teach about masks. Activities include projecting slides onto students' bodies and faces, directing students to create masks from old clothing and rags, cutting faces from magazines, and…

  5. Mask qualification strategies in a wafer fab

    NASA Astrophysics Data System (ADS)

    Jaehnert, Carmen; Kunowski, Angela

    2007-02-01

    Having consistent high quality photo masks is one of the key factors in lithography in the wafer fab. Combined with stable exposure- and resist processes, it ensures yield increases in production and fast learning cycles for technology development and design evaluation. Preventive controlling of incoming masks and quality monitoring while using the mask in production is essential for the fab to avoid yield loss or technical problems caused by mask issues, which eventually result in delivery problems to the customer. In this paper an overview of the procedures used for mask qualification and production release, for both logic and DRAM, at Infineon Dresden is presented. Incoming qualification procedures, such as specification checks, incoming inspection, and inline litho process window evaluation, are described here. Pinching and electrical tests, including compatibility tests for mask copies for high volume products on optimized litho processes, are also explained. To avoid mask degradation over lifetime, re-inspection checks are done for re-qualification while using the mask in production. The necessity of mask incoming inspection and re-qualification, due to the repeater printing from either the processing defects of the original mask or degrading defects of being used in the fab (i.e. haze, ESD, and moving particles, etc.), is demonstrated. The need and impact of tight mask specifications, such as CD uniformity signatures and corresponding electrical results, are shown with examples of mask-wafer CD correlation.

  6. Object Substitution Masking Induced by Illusory Masks: Evidence for Higher Object-Level Locus of Interference

    ERIC Educational Resources Information Center

    Hirose, Nobuyuki; Osaka, Naoyuki

    2009-01-01

    A briefly presented target can be rendered invisible by a lingering sparse mask that does not even touch it. This form of visual backward masking, called object substitution masking, is thought to occur at the object level of processing. However, it remains unclear whether object-level interference alone produces substitution masking because…

  7. Performance of GFIS mask repair system for various mask materials

    NASA Astrophysics Data System (ADS)

    Aramaki, Fumio; Kozakai, Tomokazu; Matsuda, Osamu; Yasaka, Anto; Yoshikawa, Shingo; Kanno, Koichi; Miyashita, Hiroyuki; Hayashi, Naoya

    2014-10-01

    We have developed a new focused ion beam (FIB) technology using a gas field ion source (GFIS) for mask repair. Meanwhile, since current high-end photomasks do not have high durability in exposure nor cleaning, some new photomask materials are proposed. In 2012, we reported that our GFIS system had repaired a representative new material "A6L2". It is currently expected to extend the application range of GFIS technology for various new materials and various defect shapes. In this study, we repaired a single bridge, a triple bridge and a missing hole on a phase shift mask (PSM) of "A6L2", and also repaired single bridges on a binary mask of molybdenum silicide (MoSi) material "W4G" and a PSM of high transmittance material "SDC1". The etching selectivity between those new materials and quartz were over 4:1. There were no significant differences of pattern shapes on scanning electron microscopy (SEM) images between repair and non-repair regions. All the critical dimensions (CD) at repair regions were less than +/-3% of those at normal ones on an aerial image metrology system (AIMS). Those results demonstrated that GFIS technology is a reliable solution of repairing new material photomasks that are candidates for 1X nm generation.

  8. Spatially dependent cluster dynamics modeling of microstructure evolution in low energy helium irradiated tungsten

    NASA Astrophysics Data System (ADS)

    Faney, T.; Wirth, B. D.

    2014-09-01

    In fusion reactors, plasma facing components (PFC) and in particular the divertor will be irradiated with high fluxes of low energy (˜100 eV) helium and hydrogen ions. Tungsten is one of the leading candidate divertor materials for ITER and DEMO fusion reactors. However, the behavior of tungsten under high dose, coupled helium/hydrogen exposure remains to be fully understood. The PFC response and performance changes are intimately related to microstructural changes, such as the formation of point defect clusters, helium and hydrogen bubbles or dislocation loops. Computational materials modeling has been used to investigate the mechanisms controlling microstructural evolution in tungsten following high dose, high temperature helium exposure. The aim of this study is to understand and predict helium implantation, primary defect production and defect diffusion, helium-defect clustering and interactions below a tungsten surface exposed to low energy helium irradiation. The important defects include interstitial clusters, vacancy clusters, helium interstitials and helium-vacancy clusters. We report results from a one-dimensional, spatially dependent cluster dynamics model based on the continuum reaction-diffusion rate theory to describe the evolution in space and time of all these defects. The key parameter inputs to the model (diffusion coefficients, migration and binding energies, initial defect production) are determined from a combination of atomistic materials modeling and available experimental data.

  9. Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging

    NASA Astrophysics Data System (ADS)

    Mangat, Pawitter; Verduijn, Erik; Wood, Obert R.; Benk, Markus P.; Wojdyla, Antoine; Goldberg, Kenneth A.

    2015-07-01

    Despite significant enhancements in defect detection using optical and e-beam methodology, the smaller length scales and increasing challenges of future technology nodes motivate ongoing research into the need and associated cost of actinic inspection for EUV masks. This paper reports an extensive study of two EUV patterned masks, wherein the mask blank defectivity was characterized using optical (mask and wafer) methods and bright-field mask imaging (using the SHARP actinic microscope) of previously identified blank defects. We find that the bright field actinic imaging tool microscope captures and images many defects that are not seen by the automated optical inspection of patterned masks and printed wafers. In addition, actinic review reveals the impact of multilayer damage and depicts the printability profile which can be used as an added metric to define the patterned mask repair and defect compensation strategies.

  10. Aperture masking behind AO systems

    NASA Astrophysics Data System (ADS)

    Ireland, Michael J.

    2012-07-01

    Sparse Aperture-Mask Interferometry (SAM or NRM) behind Adaptive Optics (AO) has now come of age, with more than a dozen astronomy papers published from several 5-10m class telescopes around the world. I will describe the reasons behind its success in achieving relatively high contrasts ( 1000:1 at lambda/ D) and repeatable binary astronomy at the diffraction limit, even when used behind laser-guide star adaptive optics. Placed within the context of AO calibration, the information in an image can be split into pupil-plane phase, Fourier amplitude and closure-phase. It is the closure-phase observable, or its generalisation to Kernel phase, that is immune to pupil-plane phase errors at first and second-order and has been the reason for the technique's success. I will outline the limitations of the technique and the prospects for aperture-masking and related techniques in the future.

  11. Implantable Microimagers

    PubMed Central

    Ng, David C.; Tokuda, Takashi; Shiosaka, Sadao; Tano, Yasuo; Ohta, Jun

    2008-01-01

    Implantable devices such as cardiac pacemakers, drug-delivery systems, and defibrillators have had a tremendous impact on the quality of live for many disabled people. To date, many devices have been developed for implantation into various parts of the human body. In this paper, we focus on devices implanted in the head. In particular, we describe the technologies necessary to create implantable microimagers. Design, fabrication, and implementation issues are discussed vis-à-vis two examples of implantable microimagers; the retinal prosthesis and in vivo neuro-microimager. Testing of these devices in animals verify the use of the microimagers in the implanted state. We believe that further advancement of these devices will lead to the development of a new method for medical and scientific applications.

  12. Applications of Groundwater Helium

    USGS Publications Warehouse

    Kulongoski, Justin T.; Hilton, David R.

    2011-01-01

    Helium abundance and isotope variations have widespread application in groundwater-related studies. This stems from the inert nature of this noble gas and the fact that its two isotopes ? helium-3 and helium-4 ? have distinct origins and vary widely in different terrestrial reservoirs. These attributes allow He concentrations and 3He/4He isotope ratios to be used to recognize and quantify the influence of a number of potential contributors to the total He budget of a groundwater sample. These are atmospheric components, such as air-equilibrated and air-entrained He, as well as terrigenic components, including in situ (aquifer) He, deep crustal and/or mantle He and tritiogenic 3He. Each of these components can be exploited to reveal information on a number of topics, from groundwater chronology, through degassing of the Earth?s crust to the role of faults in the transfer of mantle-derived volatiles to the surface. In this review, we present a guide to how groundwater He is collected from aquifer systems and quantitatively measured in the laboratory. We then illustrate the approach of resolving the measured He characteristics into its component structures using assumptions of endmember compositions. This is followed by a discussion of the application of groundwater He to the types of topics mentioned above using case studies from aquifers in California and Australia. Finally, we present possible future research directions involving dissolved He in groundwater.

  13. Improving vision by pupil masking.

    PubMed

    Bonaque-González, Sergio; Ríos-Rodríguez, Susana; López-Gil, Norberto

    2016-07-01

    We propose an alternative solution to improve visual quality by spatially modulating the amplitude of light passing into the eye (related to the eye's transmittance), in contrast to traditional correction of the wavefront phase (related to the local refractive power). Numerical simulations show that masking the aberrated areas at the pupil plane should enhance visual function, especially in highly aberrated eyes. This correction could be implemented in practice using customized contact or intraocular lenses. PMID:27446688

  14. Improving vision by pupil masking

    PubMed Central

    Bonaque-González, Sergio; Ríos-Rodríguez, Susana; López-Gil, Norberto

    2016-01-01

    We propose an alternative solution to improve visual quality by spatially modulating the amplitude of light passing into the eye (related to the eye's transmittance), in contrast to traditional correction of the wavefront phase (related to the local refractive power). Numerical simulations show that masking the aberrated areas at the pupil plane should enhance visual function, especially in highly aberrated eyes. This correction could be implemented in practice using customized contact or intraocular lenses. PMID:27446688

  15. High Productivity Implantation ''PARTIAL IMPLANT''

    SciTech Connect

    Hino, Masayoshi; Miyamoto, Naoki; Sakai, Shigeki; Matsumoto, Takao

    2008-11-03

    The patterned ion implantation 'PARTIAL IMPLANT' has been developed as a productivity improvement tool. The Partial Implant can form several different ion dose areas on the wafer surface by controlling the speed of wafer moving and the stepwise rotation of twist axis. The Partial Implant system contains two implant methods. One method is 'DIVIDE PARTIAL IMPLANT', that is aimed at reducing the consumption of the wafer. The Divide Partial Implant evenly divides dose area on one wafer surface into two or three different dose part. Any dose can be selected in each area. So the consumption of the wafer for experimental implantation can be reduced. The second method is 'RING PARTIAL IMPLANT' that is aimed at improving yield by correcting electrical characteristic of devices. The Ring Partial Implant can form concentric ion dose areas. The dose of wafer external area can be selected to be within plus or minus 30% of dose of wafer central area. So the electrical characteristic of devices can be corrected by controlling dose at edge side on the wafer.

  16. Mask pattern generator employing EPL technology

    NASA Astrophysics Data System (ADS)

    Yoshioka, Nobuyuki; Yamabe, Masaki; Wakamiya, Wataru; Endo, Nobuhiro

    2003-08-01

    Mask cost is one of crucial issues in device fabrication, especially in SoC (System on a Chip) with small-volume production. The cost mainly depends on productivity of mask manufacturing tools such as mask writers and defect inspection tools. EPL (Electron Projection Lithography) has been developing as a high-throughput electron beam exposure technology that will succeed optical lithography. The application of EPL technology to mask writing will result in high productivity and contribute to decrease the mask cost. The concept of a mask pattern generator employing EPL technology is proposed in this paper. It is very similar to EPL technology used for pattern printing on a wafer. The mask patterns on the glass substrate are exposed by projecting the basic circuit patterns formed on the mother EPL mask. One example of the mother EPL mask is a stencil type made with 200-mm Si wafer. The basic circuit patterns are IP patterns and logical primitive patterns such as cell libraries (AND, OR, Inverter, Flip-Flop and etc.) to express the SoC device patterns. Since the SoC patterns are exposed with its collective units such as IP and logical primitive patterns by using this method, the high throughput will be expected comparing with conventional mask E-beam writers. In this paper, the mask pattern generator with the EPL technology is proposed. The concept, its advantages and issues to be solved are discussed.

  17. Process capability of etched multilayer EUV mask

    NASA Astrophysics Data System (ADS)

    Takai, Kosuke; Iida nee Sakurai, Noriko; Kamo, Takashi; Morikawa, Yasutaka; Hayashi, Naoya

    2015-10-01

    With shrinking pattern size at 0.33NA EUV lithography systems, mask 3D effects are expected to become stronger, such as horizontal/vertical shadowing, best focus shifts through pitch and pattern shift through focus. Etched multilayer EUV mask structures have been proposed in order to reduce mask 3D effects. It is estimated that etched multilayer type mask is also effective in reducing mask 3D effects at 0.33NA with lithographic simulation, and it is experimentally demonstrated with NXE3300 EUV Lithography system. We obtained cross-sectional TEM image of etched multilayer EUV mask pattern. It is observed that patterned multilayer width differs from pattern physical width. This means that effective reflecting width of etched multilayer pattern is smaller than pattern width measured by CD-SEM. In this work, we evaluate mask durability against both chemical and physical cleaning process to check the feasibility of etched multilayer EUV mask patterning against mask cleaning for 0.33NA EUV extension. As a result, effective width can be controlled by suitable cleaning chemicals because sidewall film works as a passivation film. And line and space pattern collapse is not detected by DUV mask pattern inspection tool after mask physical cleaning that includes both megasonic and binary spray steps with sufficient particle removal efficiency.

  18. Helium anion formation inside helium droplets

    NASA Astrophysics Data System (ADS)

    Maalouf, Elias Jabbour Al; Reitshammer, Julia; Ribar, Anita; Scheier, Paul; Denifl, Stephan

    2016-07-01

    The formation of He∗- is examined with improved electron energy resolution of about 100 meV utilizing a hemispherical electron monochromator. The work presented provides a precise determination of the three previously determined resonance peak positions that significantly contribute to the formation of He∗- inside helium nanodroplets in the energy range from 20 eV to 29.5 eV. In addition, a new feature is identified located at 27.69 ± 0.18 eV that we assign to the presence of O2 as a dopant inside the droplet. With increasing droplet size a small blue shift of the resonance positions is observed. Also for the relatively low electron currents used in the present study (i.e., 15-70 nA) a quadratic dependence of the He∗- ion yield on the electron current is observed. Contribution to the Topical Issue "Advances in Positron and Electron Scattering", edited by Paulo Limao-Vieira, Gustavo Garcia, E. Krishnakumar, James Sullivan, Hajime Tanuma and Zoran Petrovic.

  19. Cortical correlate of pattern backward masking.

    PubMed Central

    Kovács, G; Vogels, R; Orban, G A

    1995-01-01

    The perception of a briefly presented shape is strongly impaired when it is followed by another pattern, a phenomenon called backward masking. We found that the vast majority of a sample of shape-selective neurons in the macaque inferior temporal cortex respond selectively to backward-masked shapes, although these shapes could not be discriminated by human and monkey subjects. However, this selective response was brief, since it was either interrupted by the mask or overridden by a response to the mask itself. We show that reliable discrimination of briefly presented shapes by single neurons depends on the temporal integration of the response. Presentation of the mask, however, reduces the number of spikes available for integration, explaining backward masking. These results also provide direct neurophysiological evidence for the "interruption theory" of backward masking. PMID:7777553

  20. History and future of mask making

    NASA Astrophysics Data System (ADS)

    Levy, Ken L.

    1996-12-01

    The history of the mask industry has three main periods, which I call the Classical Period, the Dark Ages, and the Renaissance, by analogy with those periods in the history of Western Europe. During the Classical Period, people developed 1X masks and the technology to make them. In the Dark Ages, people exploited the equipment developed during the Classical Period to make 5X reduction reticle, ending the nobility of mask making. In today's Renaissance of mask making, a proliferation of mask types is requiring a rebirth of innovation and creativity. The Renaissance resembles the Classical Period: masks are once again strategic, and technological capability is once again the driver. Meanwhile, the mask industry is carrying forward the productivity and efficiency gains it achieved during the Dark Ages. We must create a new business and economic model to support these changes in the characteristics of the marketplace.

  1. 42 CFR 84.110 - Gas masks; description.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... as follows: (1) Front-mounted or back-mounted gas mask. A gas mask which consists of a full facepiece.... (2) Chin-style gas mask. A gas mask which consists of a full facepiece, a canister which is usually attached to the facepiece, and associated connections. (3) Escape gas mask. A gas mask designed for...

  2. Fabrication and commercialization of scalpel masks

    NASA Astrophysics Data System (ADS)

    Novembre, Anthony E.; Peabody, Milton L., Jr.; Blakey, Myrtle I.; Farrow, Reginald C.; Kasica, Richard J.; Liddle, James A.; Saunders, Thomas E.; Tennant, Donald M.

    1998-09-01

    SCALPEL masks have been fabricated for use in the Proof-of- Lithography system and to demonstrate the feasibility of having them produced by a commercial blank manufacturer and optical mask shops. Masks blanks are formed from 100 mm diameter silicon wafers. A 100-150 nm thick SiNx layer is LPCVD deposited onto the wafers followed by magnetron sputter deposition of a thin Cr/W metal layer which is used as the scatterer layer for the mask>the mask is supported by an underlying network of struts which are arranged to be compatible with the step and scan writing strategy of the exposure tool and to provide robustness to the mask. Crystallographic wet etching of the silicon wafer forms membranes and struts. To date over 300 mask blanks have been formed and yield data as a function of the thickness of the silicon nitride membrane has been quantified. Recent developments in the mask blank formation process include the production of blanks by MCNC who serve as a commercial source of SCALPEL mask blanks. They have successfully delivered 36 blanks that exhibit equivalent properties to those produced at Lucent. Mask patterning has been performed at the commercial optical mask shops of PHOTRONICS and DUPONT. In this investigation a MEBES exposure system has been used to write patterns. The resist used is ZEP-520 and development and pattern transfer processes are performed in the STEAG-Hammatech spray/spin processing tool. Metrology is performed using a KMS 310 RT optical microscope. Pattern placement accuracy is measured on the LMS 2020 system without modification. The masks are inspected for defects using the optical based KLA 300 series inspection system in a die to die mode and in transmission. Results to date suggest feasibility of producing SCALPEL masks by a commercial blank supplier and by merchant optical mask shops.

  3. Comparative Study of Manufacturing Techniques for Coronagraphic Binary Pupil Masks: Masks on Substrates and Free-Standing Masks

    NASA Astrophysics Data System (ADS)

    Enya, Keigo; Haze, Kanae; Kotani, Takayuki; Abe, Lyu

    2012-12-01

    We present a comparative study of the manufacture of binary pupil masks for coronagraphic observations of exoplanets. A checkerboard mask design, a type of binary pupil mask design, was adopted, and identical patterns of the same size were used for all masks in order that we could compare the differences resulting from the different manufacturing methods. The masks on substrates had aluminum checkerboard patterns with thicknesses of 0.1/0.2/0.4/0.8/1.6μm, constructed on substrates of BK7 glass, silicon, and germanium using photolithography and chemical processes. Free-standing masks made of copper and nickel with thicknesses of 2/5/10/20μm were also realized using photolithography and chemical processes, which included careful release from the substrate used as an intermediate step in the manufacture. Coronagraphic experiments using a visible laser were carried out for all masks on BK7 glass substrate and the free-standing masks. The average contrasts were 8.4 × 10-8, 1.2 × 10-7, and 1.2 × 10-7 for the masks on BK7 substrates, the free-standing copper masks, and the free-standing nickel masks, respectively. No significant correlation was concluded between the contrast and the mask properties. The high-contrast masks have the potential to cover the needs of coronagraphs for both ground-based and space-borne telescopes over a wide wavelength range. Especially, their application to the infrared space telescope, SPICA, is appropriate.

  4. Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication

    NASA Astrophysics Data System (ADS)

    Akeno, Kiminobu; Ogasawara, Munehiro; Ooki, Kenji; Tojo, Toru; Hirano, Ryoichi; Yoshitake, Shusuke; Toriumi, Masaki; Sekine, Akihiko; Takigawa, Tadahiko; Shinoda, Toshiki; Noguchi, Shigeru

    2002-09-01

    An in-situ measurement system for particles in an electron beam (EB) writer is developed to improve mask yield management. The system has satisfied the required installation specifications for a mask blank inspection system for the EB writer, and the results of an experiment using the system prove that particles added from the mask handling system in our EB writer satisfy the total particle count specification (<1.25 counts/cycle for 6 inch mask). The investigation of particle increase after repeated mask movement has been carried out in each segmented mask handling route. It has been clarified that the segmentation test using this system is helpful for investigation of the origin of particle production on a mask. Effective application of information such as particle position and size obtained by this system will be very useful for improving mask yield management in the mask fabrication process in terms of pattern inspection and repair system.

  5. High performance mask fabrication process for the next-generation mask production

    NASA Astrophysics Data System (ADS)

    Yagawa, Keisuke; Ugajin, Kunihiro; Suenaga, Machiko; Kobayashi, Yoshihito; Motokawa, Takeharu; Hagihara, Kazuki; Saito, Masato; Itoh, Masamitsu

    2014-07-01

    ArF immersion lithography combined with double patterning has been used for fabricating below half pitch 40nm devices. However, when pattern size shrinks below 20nm, we must use new technology like quadruple patterning process or next generation lithography (NGL) solutions. Moreover, with change in lithography tool, next generation mask production will be needed. According to ITRS 2013, fabrication of finer patterns less than 15nm will be required on mask plate in NGL mask production 5 years later [1]. In order to fabricate finer patterns on mask, higher resolution EB mask writer and high performance fabrication process will be required. In a previous study, we investigated a potential of mask fabrication process for finer patterning and achieved 17nm dense line pattern on mask plate by using VSB (Variable Shaped Beam) type EB mask writer and chemically amplified resist [2][3]. After a further investigation, we constructed higher performance mask process by using new EB mask writer EBM9000. EBM9000 is the equipment supporting hp16nm generation's photomask production and has high accuracy and high throughput. As a result, we achieved 15.5nm pattern on mask with high productivity. Moreover, from evaluation of isolated pattern, we proved that current mask process has the capability for sub-10nm pattern. These results show that the performance of current mask fabrication process have the potential to fabricate the next-generation mask.

  6. Helium jet dispersion to atmosphere

    NASA Astrophysics Data System (ADS)

    Khan, Hasna J.

    On the event of loss of vacuum guard of superinsulated helium dewar, high rate of heat transfer into the tank occurs. The rapid boiling of liquid helium causes the burst disk to rupture at four atmospheres and consequently the helium passes to the atmosphere through vent lines. The gaseous helium forms a vertical buoyant jet as it exits the vent line into a stagnant environment. Characterization of the gaseous jet is achieved by detailed analysis of the axial and radial dependence of the flow parameters.

  7. Helium cryopumping for fusion applications

    SciTech Connect

    Sedgley, D.W.; Batzer, T.H.; Call, W.R.

    1988-05-01

    Large quantities of helium and hydrogen isotopes will be exhausted continuously from fusion power reactors. This paper summarizes two development programs undertaken to address vacuum pumping for this application: (i) A continuous duty cryopump for pumping helium and/or hydrogen species using charcoal sorbent and (ii) a cryopump configuration with an alternative shielding arrangement using charcoal sorbent or argon spray. A test program evaluated automatic pumping of helium, helium pumping by charcoal cryosorption and with argon spray, and cryosorption of helium/hydrogen mixtures. The continuous duty cryopump pumped helium continuously and conveniently. Helium pumping speed was 7.7 l/s/cm/sup 2/ of charcoal, compared to 5.8 l/s/cm/sup 2/ for the alternative pump. Helium speed using argon spray was 18% of that obtained by charcoal cryosorption in the same (W-panel) pump. During continuous duty cryopump mixture tests with helium and hydrogen copumped on charcoal, gas was released sporadically. Testing was insufficient to explain this unacceptable event.

  8. [Implant allergies].

    PubMed

    Thomas, P; Thomsen, M

    2010-03-01

    An increasing number of patients receive and benefit from osteosynthesis materials or artificial joint replacement. The most common complications are mechanical problems or infection. Metals like nickel, chromium and cobalt as well as bone cement components like acrylates and gentamicin are potential contact allergens which can cause intolerance reactions to implants. Eczema, delayed wound/bone healing, recurrent effusions, pain and implant loosening all have been described as manifestation of implant allergy. In contrast to the high incidence of cutaneous metal allergy, allergies associated with implants are rare. Diagnosis of metal implant allergy is still difficult. Thus differential diagnoses--in particular infection--have to be excluded and a combined approach of allergologic diagnostics by patch test and histopathology of peri-implant tissue is recommended. It is still unknown which conditions induce allergic sensitization to implants or trigger peri-implant allergic reactions in the case of preexisting cutaneous metal allergy. Despite the risk of developing complications being unclear, titanium based osteosynthesis materials are recommended for metal allergic patients and the use of metal-metal couplings in arthroplasty is not recommended for such patients. If the regular CoCr-polyethylene articulation is employed, the patient should give informed written consent. PMID:20204719

  9. 48 CFR 52.208-8 - Required Sources for Helium and Helium Usage Data.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... Helium and Helium Usage Data. 52.208-8 Section 52.208-8 Federal Acquisition Regulations System FEDERAL... Provisions and Clauses 52.208-8 Required Sources for Helium and Helium Usage Data. As prescribed in 8.505, insert the following clause: Required Sources for Helium and Helium Usage Data (APR 2002) (a)...

  10. 48 CFR 52.208-8 - Required Sources for Helium and Helium Usage Data.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... Helium and Helium Usage Data. 52.208-8 Section 52.208-8 Federal Acquisition Regulations System FEDERAL... Provisions and Clauses 52.208-8 Required Sources for Helium and Helium Usage Data. As prescribed in 8.505, insert the following clause: Required Sources for Helium and Helium Usage Data (APR 2014) (a)...

  11. 48 CFR 52.208-8 - Required Sources for Helium and Helium Usage Data.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... Helium and Helium Usage Data. 52.208-8 Section 52.208-8 Federal Acquisition Regulations System FEDERAL... Provisions and Clauses 52.208-8 Required Sources for Helium and Helium Usage Data. As prescribed in 8.505, insert the following clause: Required Sources for Helium and Helium Usage Data (APR 2002) (a)...

  12. 48 CFR 52.208-8 - Required Sources for Helium and Helium Usage Data.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... Helium and Helium Usage Data. 52.208-8 Section 52.208-8 Federal Acquisition Regulations System FEDERAL... Provisions and Clauses 52.208-8 Required Sources for Helium and Helium Usage Data. As prescribed in 8.505, insert the following clause: Required Sources for Helium and Helium Usage Data (APR 2002) (a)...

  13. 48 CFR 52.208-8 - Required Sources for Helium and Helium Usage Data.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... Helium and Helium Usage Data. 52.208-8 Section 52.208-8 Federal Acquisition Regulations System FEDERAL... Provisions and Clauses 52.208-8 Required Sources for Helium and Helium Usage Data. As prescribed in 8.505, insert the following clause: Required Sources for Helium and Helium Usage Data (APR 2002) (a)...

  14. A model of visual backward masking.

    PubMed

    Bugmann, Guido; Taylor, John G

    2005-01-01

    When two successive stimuli are presented within 0-200 ms intervals, the recognition of the first stimulus (the target) can be impaired by the second (the mask). This backward masking phenomenon has a form called metacontrast masking where the target and the mask are in close spatial proximity but not overlapping. In that case, the masking effect is strongest for interval of 60-100 ms. To understand this behaviour, activity propagation in a feedforward network of leaky integrate and fire neurons is investigated. It is found that, if neurons have a selectivity similar to that of V1 simple cells, activity decays layer after layer and ceases to propagate. To combat this, a local amplification mechanism is included in the model, using excitatory lateral connections, which turn out to support prolonged self-sustained activity. Masking is assumed to arise from local competition between representations recruited by the target and the mask. This tends to interrupt sustained firing, while prolonged retinal input tends to re-initiate it. Thus, masking causes a maximal reduction of the duration of the cortical response to the target towards the end of the retinal response. This duration exhibits the typical U-shape of the masking curve. In this model, masking does not alter the propagation of the onset of the response to the target, thus preserving response reaction times and enabling unconscious priming phenomena. PMID:15649600

  15. EUVL mask repair: expanding options with nanomachining

    NASA Astrophysics Data System (ADS)

    Gallagher, Emily; McIntyre, Gregory; Lawliss, Mark; Robinson, Tod; Bozak, Ronald; White, Roy; LeClaire, Jeff

    2012-11-01

    Mask defectivity is often cited as a barrier to EUVL manufacturing, falling just behind low source power. Mask defectivity is a combination of intrinsic blank defects, defects introduced during the mask fabrication and defects introduced during the use of the mask in the EUV exposure tool. This paper works towards minimizing the printing impact of blank defects so that the final EUVL mask can achieve a lower defectivity. Multilayer defects can be created by a step or scratch as shallow as 1nm in the substrate. These small defects create coherent disruptions in the multilayer that can generate significant variations in mask reflectivity and induce clearly-defined, printable defects. If the optical properties of the defect can be well understood, nanomachining repair processes can be deployed to fix these defects. The purpose of this work is to develop new nanomachining repair processes and approaches that can repair complex EUVL mask defects by targeted removal of the EUVL mask materials. The first phase of this work uses nanomachining to create artificial phase defects of different types and sizes for both printability evaluation and benchmarking with simulation. Experimental results validate the concept, showing a reasonable match between imaging with the LBNL Actinic Inspection Tool (AIT) and simulation of the mask topography measured by AFM. Once the printability of various nanomachined structures is understood, the second phase of the work aims to optimize the process to repair real EUVL mask defects with surrounding absorber patterns.

  16. Mask data volume: explosion or damp squib?

    NASA Astrophysics Data System (ADS)

    Spence, Chris; Goad, Scott; Buck, Peter; Gladhill, Richard; Cinque, Russell

    2005-11-01

    Mask data file sizes are increasing as we move from technology generation to generation. The historical 30% linear shrink every 2-3 years that has been called Moore's Law, has driven a doubling of the transistor budget and hence feature count. The transition from steppers to step-and-scan tools has increased the area of the mask that needs to be patterned. At the 130nm node and below, Optical Proximity Correction (OPC) has become prevalent, and the edge fragmentation required to implement OPC leads to an increase in the number of polygons required to define the layout. Furthermore, Resolution Enhancement Techniques (RETs) such as Sub-Resolution Assist Features (SRAFs) or tri-tone Phase Shift Masks (PSM) require additional features to be defined on the mask which do not resolve on the wafer, further increasing masks volumes. In this paper we review historical data on mask file sizes for microprocessor designs. We consider the consequences of this increase in file size on Mask Data Prep (MDP) activities, both within the Integrated Device Manufacturer (IDM) and Mask Shop, namely: computer resources, storage and networks (for file transfer). The impact of larger file sizes on mask writing times is also reviewed. Finally we consider, based on the trends that have been observed over the last 5 technology nodes, what will be required to maintain reasonable MDP and mask manufacturing cycle times.

  17. Electrostatic chucking and EUVL mask flatness analysis

    NASA Astrophysics Data System (ADS)

    Nataraju, M.; Mikkelson, A.; Sohn, J.; Engelstad, R. L.; Lovell, E. G.

    2005-11-01

    Successful implementation of Extreme Ultraviolet Lithography (EUVL) depends on advancements in many areas, including the quality of the mask and chuck system to control image placement (IP) errors. One source of IP error is the height variations of the patterned mask surface (i.e., its nonflatness). The SEMI EUVL mask and chucking standards (SEMI P37 and SEMI P40) describe stringent requirements for the nonflatness of the mask frontside and backside, and the chucking surfaces. Understanding and characterizing the clamping ability of the electrostatic chuck and the effect on the mask flatness is therefore critical in order to meet these requirements. Legendre polynomials have been identified as an effective and efficient means of representing EUVL mask surface shapes. Finite element (FE) models have been developed to utilize the Legendre coefficients (obtained from measured mask and chuck data) as input data to define the surfaces of the mask and the chuck. The FE models are then used to determine the clamping response of the mask and the resulting flatness of the pattern surface. The sum of the mask thickness nonuniformity and the chuck surface shape has a dominant effect on the flatness of the patterned surface after chucking. The focus of the present research is a comprehensive analysis of the flatness and interaction between the nonflat chuck and the mask. Experiments will be conducted using several sample masks chucked by a slab type electrostatic chuck. Results from the study will support and facilitate the timely development of EUVL mask/chuck systems which meet required specifications.

  18. Regimes of Helium Burning

    SciTech Connect

    Timmes, F. X.; Niemeyer, J. C.

    2000-07-10

    The burning regimes encountered by laminar deflagrations and Zeldovich von Neumann Doering [ZND] detonations propagating through helium-rich compositions in the presence of buoyancy-driven turbulence are analyzed. Particular attention is given to models of X-ray bursts that start with a thermonuclear runaway on the surface of a neutron star and to the thin-shell helium instability of intermediate-mass stars. In the X-ray burst case, turbulent deflagrations propagating in the lateral or radial direction encounter a transition from the distributed regime to the flamelet regime at a density of {approx}108 g cm-3. In the radial direction, the purely laminar deflagration width is larger than the pressure scale height for densities smaller than {approx}106 g cm-3. Self-sustained laminar deflagrations traveling in the radial direction cannot exist below this density. Similarly, the planar ZND detonation width becomes larger than the pressure scale height at {approx}107 g cm-3, suggesting that steady state, self-sustained detonations cannot come into existence in the radial direction. In the thin helium shell case, turbulent deflagrations traveling in the lateral or radial direction encounter the distributed regime at densities below {approx}107 g cm-3 and the flamelet regime at larger densities. In the radial direction, the purely laminar deflagration width is larger than the pressure scale height for densities smaller than {approx}104 g cm-3, indicating that steady state laminar deflagrations cannot form below this density. The planar ZND detonation width becomes larger than the pressure scale height at {approx}5x10{sup 4} g cm-3, suggesting that steady state, self-sustained detonations cannot come into existence in the radial direction. (c) 2000 The American Astronomical Society.

  19. Mask blank particle inspection in vacuum environments

    NASA Astrophysics Data System (ADS)

    Sekine, Akihiko; Nagahama, Hiroyuki; Tojo, Toru; Akeno, Kiminobu; Hirano, Ryoichi

    2002-10-01

    The mask blank surface inspection system for the electron beam mask writing system (EB mask writer) has developed. This system, that has the small vacuum chamber attachable to EB mask writer, inspects a mask blank that is just before EB writing in vacuum environments. It can inspect whole area of the 230mm mask at 0.3micrometer sensitivity. It also can perform fast inspection by applying the original scanning algorithm for the laser beam. It has the wide detective range from 0.3 to 2.0 micrometers of particle size. It can distinguish sizes of particles in that range. The auto focus function is most important factor for maintaining the sensitivity.

  20. Polarization masks: concept and initial assessment

    NASA Astrophysics Data System (ADS)

    Lam, Michael; Neureuther, Andrew R.

    2002-07-01

    Polarization from photomasks can be used as a new lever to improve lithographic performance in both binary and phase-shifting masks (PSMs). While PSMs manipulate the phase of light to control the temporal addition of electric field vectors, polarization masks manipulate the vector direction of electric field vectors to control the spatial addition of electric field components. This paper explores the theoretical possibilities of polarization masks, showing that it is possible to use bar structures within openings on the mask itself to polarize incident radiation. Rigorous electromagnetic scattering simulations using TEMPEST and imaging with SPLAT are used to give an initial assessment on the functionality of polarization masks, discussing the polarization quality and throughputs achieved with the masks. Openings between 1/8 and 1/3 of a wavelength provide both a low polarization ratio and good transmission. A final overall throughput of 33% - 40% is achievable, corresponding to a dose hit of 2.5x - 3x.

  1. Helium dilution refrigeration system

    DOEpatents

    Roach, P.R.; Gray, K.E.

    1988-09-13

    A helium dilution refrigeration system operable over a limited time period, and recyclable for a next period of operation is disclosed. The refrigeration system is compact with a self-contained pumping system and heaters for operation of the system. A mixing chamber contains [sup 3]He and [sup 4]He liquids which are precooled by a coupled container containing [sup 3]He liquid, enabling the phase separation of a [sup 3]He rich liquid phase from a dilute [sup 3]He-[sup 4]He liquid phase which leads to the final stage of a dilution cooling process for obtaining low temperatures. The mixing chamber and a still are coupled by a fluid line and are maintained at substantially the same level with the still cross sectional area being smaller than that of the mixing chamber. This configuration provides maximum cooling power and efficiency by the cooling period ending when the [sup 3]He liquid is depleted from the mixing chamber with the mixing chamber nearly empty of liquid helium, thus avoiding unnecessary and inefficient cooling of a large amount of the dilute [sup 3]He-[sup 4]He liquid phase. 2 figs.

  2. Helium dilution refrigeration system

    DOEpatents

    Roach, Patrick R.; Gray, Kenneth E.

    1988-01-01

    A helium dilution refrigeration system operable over a limited time period, and recyclable for a next period of operation. The refrigeration system is compact with a self-contained pumping system and heaters for operation of the system. A mixing chamber contains .sup.3 He and .sup.4 He liquids which are precooled by a coupled container containing .sup.3 He liquid, enabling the phase separation of a .sup.3 He rich liquid phase from a dilute .sup.3 He-.sup.4 He liquid phase which leads to the final stage of a dilution cooling process for obtaining low temperatures. The mixing chamber and a still are coupled by a fluid line and are maintained at substantially the same level with the still cross sectional area being smaller than that of the mixing chamber. This configuration provides maximum cooling power and efficiency by the cooling period ending when the .sup.3 He liquid is depleted from the mixing chamber with the mixing chamber nearly empty of liquid helium, thus avoiding unnecessary and inefficient cooling of a large amount of the dilute .sup.3 He-.sup.4 He liquid phase.

  3. A helium regenerative compressor

    SciTech Connect

    Swift, W.L.; Nutt, W.E.; Sixsmith, H.

    1994-12-31

    This paper discusses the design and performance of a regenerative compressor that was developed primarily for use in cryogenic helium systems. The objectives for the development were to achieve acceptable efficiency in the machine using conventional motor and bearing technology while reducing the complexity of the system required to control contamination from the lubricants. A single stage compressor was built and tested. The compressor incorporates aerodynamically shaped blades on a 218 mm (8.6 inches) diameter impeller to achieve high efficiency. A gas-buffered non-contact shaft seal is used to oppose the diffusion of lubricant from the motor bearings into the cryogenic circuit. Since it is a rotating machine, the flow is continuous and steady, and the machine is very quiet. During performance testing with helium, the single stage machine has demonstrated a pressure ratio of 1.5 at a flow rate of 12 g/s with measured isothermal efficiencies in excess of 30%. This performance compares favorably with efficiencies generally achieved in oil flooded screw compressors.

  4. Polyurethane Masks Large Areas in Electroplating

    NASA Technical Reports Server (NTRS)

    Beasley, J. L.

    1985-01-01

    Polyurethane foam provides effective mask in electroplating of copper or nickel. Thin layer of Turco maskant painted on area to be masked: Layer ensures polyurethane foam removed easily after served its purpose. Component A, isocyanate, and component B, polyol, mixed together and brushed or sprayed on mask area. Mixture reacts, yielding polyurethane foam. Foam prevents deposition of nickel or copper on covered area. New method saves time, increases productivity and uses less material than older procedures.

  5. Mask lithography for display manufacturing

    NASA Astrophysics Data System (ADS)

    Sandstrom, T.; Ekberg, P.

    2010-05-01

    The last ten years have seen flat displays conquer our briefcases, desktops, and living rooms. There has been an enormous development in production technology, not least in lithography and photomasks. Current masks for large displays are more than 2 m2 and make 4-6 1X prints on glass substrates that are 9 m2. One of the most challenging aspects of photomasks for displays is the so called mura, stripes or blemishes which cause visible defects in the finished display. For the future new and even tighter maskwriter specifications are driven by faster transistors and more complex pixel layouts made necessary by the market's wish for still better image quality, multi-touch panels, 3D TVs, and the next wave of e-book readers. Large OLED screens will pose new challenges. Many new types of displays will be lowcost and use simple lithography, but anything which can show video and high quality photographic images needs a transistor backplane and sophisticated masks for its production.

  6. VIIRS Cloud Mask Validation Exercises

    NASA Astrophysics Data System (ADS)

    Frey, R.; Heidinger, A. K.; Hutchison, K.; Dutcher, S.

    2011-12-01

    The NPP Satellite is scheduled for launch October 25, 2011. Included on the platform is the VIIRS (Visible/Infrared Imager/Suite) instrument which features 16 bands at about 0.75 m spatial resolution and 5 imager bands at roughly 0.375 m resolution. The basic VIIRS cloud mask (VCM) output is a flag that indicates one of four possible cloudy vs. clear conditions for each 0.75 m pixel: confident clear, probably clear, probably cloudy, and confident cloudy. Pre-launch assessment of the VCM algorithm has been performed with use of MODIS observations as proxy input. Several comparisons are shown between VCM results and cloud detection from other instruments and/or algorithms: MODIS cloud mask (MOD35) at the five-minute granule level (L2), global and regional monthly average cloud amounts from MODIS (MOD35) and MODIS-CERES, ISCCP, PATMOS-x (AVHRR), and CALIOP (lidar). In addition to overall results, collocated MODIS observations, CALIOP and VCM cloud determinations are used to evaluate VCM cloud test thresholds and other tunable parameters. The methods shown will be among those used during the Intensive Calibration and Validation period and beyond.

  7. Evaluation of a native vegetation masking technique

    NASA Technical Reports Server (NTRS)

    Kinsler, M. C.

    1984-01-01

    A crop masking technique based on Ashburn's vegetative index (AVI) was used to evaluate native vegetation as an indicator of crop moisture condition. A mask of the range areas (native vegetation) was generated for each of thirteen Great Plains LANDSAT MSS sample segments. These masks were compared to the digitized ground truth and accuracies were computed. An analysis of the types of errors indicates a consistency in errors among the segments. The mask represents a simple quick-look technique for evaluating vegetative cover.

  8. Determination of mask induced polarization effects on AltPSM mask structures

    NASA Astrophysics Data System (ADS)

    Hollein, Ingo; Teuber, Silvio; Bubke, Karsten

    2005-06-01

    In the process of discussion of possible mask-types for the 5x nm node (half-pitch) and below, the alternating phase-shifting mask (AltPSM) is a potential candidate to be screened. The current scenario suggests using 193 nm immersion lithography with NA values of up to 1.2 and above. New optical effects from oblique incident angles, mask-induced polarization of the transmitted light and birefringence from the substrate need to be taken into account when the optical performance of a mask is evaluated. This paper addresses mask induced polarization effects from dense lines-and-space structures on a real mask. Measurements of the polarization dependent diffraction efficiencies have been performed on AltPSM masks. Experimental results show good agreement with simulations. A comparison with Binary Masks is made.

  9. A cluster randomised trial of cloth masks compared with medical masks in healthcare workers

    PubMed Central

    MacIntyre, C Raina; Seale, Holly; Dung, Tham Chi; Hien, Nguyen Tran; Nga, Phan Thi; Chughtai, Abrar Ahmad; Rahman, Bayzidur; Dwyer, Dominic E; Wang, Quanyi

    2015-01-01

    Objective The aim of this study was to compare the efficacy of cloth masks to medical masks in hospital healthcare workers (HCWs). The null hypothesis is that there is no difference between medical masks and cloth masks. Setting 14 secondary-level/tertiary-level hospitals in Hanoi, Vietnam. Participants 1607 hospital HCWs aged ≥18 years working full-time in selected high-risk wards. Intervention Hospital wards were randomised to: medical masks, cloth masks or a control group (usual practice, which included mask wearing). Participants used the mask on every shift for 4 consecutive weeks. Main outcome measure Clinical respiratory illness (CRI), influenza-like illness (ILI) and laboratory-confirmed respiratory virus infection. Results The rates of all infection outcomes were highest in the cloth mask arm, with the rate of ILI statistically significantly higher in the cloth mask arm (relative risk (RR)=13.00, 95% CI 1.69 to 100.07) compared with the medical mask arm. Cloth masks also had significantly higher rates of ILI compared with the control arm. An analysis by mask use showed ILI (RR=6.64, 95% CI 1.45 to 28.65) and laboratory-confirmed virus (RR=1.72, 95% CI 1.01 to 2.94) were significantly higher in the cloth masks group compared with the medical masks group. Penetration of cloth masks by particles was almost 97% and medical masks 44%. Conclusions This study is the first RCT of cloth masks, and the results caution against the use of cloth masks. This is an important finding to inform occupational health and safety. Moisture retention, reuse of cloth masks and poor filtration may result in increased risk of infection. Further research is needed to inform the widespread use of cloth masks globally. However, as a precautionary measure, cloth masks should not be recommended for HCWs, particularly in high-risk situations, and guidelines need to be updated. Trial registration number Australian New Zealand Clinical Trials Registry: ACTRN12610000887077. PMID

  10. Simulation of Helium-3 Extraction from Lunar Ilmenite

    NASA Technical Reports Server (NTRS)

    Kuhlman, K. R.; Kulcinski, G. L.; Schmitt, H. H.

    2004-01-01

    Knowledge of the trapping mechanisms and diffusion characteristics of solar-wind implanted isotopes in the minerals of the lunar regolith will enable the optimization of the processes to extract solar wind gases from regolith particles. Extraction parameters include the temperature and duration of extraction, particle size, and gas yield. Diffusion data will increase the efficiency and profitability of future mining ventures. This data will also assist in optimizing the evaluations of various potential mining sites based on remote sensing data. For instance, if magnesian ilmenite (Mg,Fel.,Ti03) is found to retain He better than stoichiometric ilmenite (FeTi03), remote sensing data for Mg could be considered in addition to Ti and maturity data. The context of the currently discussed work is the mining of helium-3 for potential use as a fuel for fusion energy generation. However, the potential resources deposited by the solar wind include hydrogen (and derived water), helium-4, nitrogen and carbon. Implantation experiments such as those performed for helium isotopes in ilmenite are important for the optimized extraction of these additional resources. These experiments can easily be reproduced for most elements or isotopes of interest.

  11. Cochlear Implants

    MedlinePlus

    ... additional visits are needed for activating, adjusting, and programming the various electrodes that have been implanted. Also, ... to the center for checkups once the final programming is made to the speech processor. Both children ...

  12. Histrelin Implant

    MedlinePlus

    ... bone growth and development of sexual characteristics) in girls usually between 2 and 8 years of age ... MRI scans (radiology techniques designed to show the images of body structures) to find the implant when ...

  13. Goserelin Implant

    MedlinePlus

    ... which the type of tissue that lines the uterus [womb] grows in other areas of the body ... with the treatment of abnormal bleeding of the uterus. Goserelin implant is in a class of medications ...

  14. Ion Implantation

    NASA Astrophysics Data System (ADS)

    Langouche, G.; Yoshida, Y.

    In this tutorial we describe the basic principles of the ion implantation technique and we demonstrate that emission Mössbauer spectroscopy is an extremely powerful technique to investigate the atomic and electronic configuration around implanted atoms. The physics of dilute atoms in materials, the final lattice sites and their chemical state as well as diffusion phenomena can be studied. We focus on the latest developments of implantation Mössbauer spectroscopy, where three accelerator facilities, i.e., Hahn-Meitner Institute Berlin, ISOLDE-CERN and RIKEN, have intensively been used for materials research in in-beam and on-line Mössbauer experiments immediately after implantation of the nuclear probes.

  15. Dental Implants

    MedlinePlus Videos and Cool Tools

    ... facts so you can make an informed decision as to whether dental implants are right for your ... the jaw bone. It’s obviously not the same as the original connection , but functions just the same. ...

  16. Set Size and Mask Duration Do Not Interact in Object-Substitution Masking

    ERIC Educational Resources Information Center

    Argyropoulos, Ioannis; Gellatly, Angus; Pilling, Michael; Carter, Wakefield

    2013-01-01

    Object-substitution masking (OSM) occurs when a mask, such as four dots that surround a brief target item, onsets simultaneously with the target and offsets a short time after the target, rather than simultaneously with it. OSM is a reduction in accuracy of reporting the target with the temporally trailing mask, compared with the simultaneously…

  17. Fast mask writers: technology options and considerations

    NASA Astrophysics Data System (ADS)

    Litt, Lloyd C.; Groves, Timothy; Hughes, Greg

    2011-04-01

    The semiconductor industry is under constant pressure to reduce production costs even as the complexity of technology increases. Lithography represents the most expensive process due to its high capital equipment costs and the implementation of low-k1 lithographic processes, which have added to the complexity of making masks because of the greater use of optical proximity correction, pixelated masks, and double or triple patterning. Each of these mask technologies allows the production of semiconductors at future nodes while extending the utility of current immersion tools. Low-k1 patterning complexity combined with increased data due to smaller feature sizes is driving extremely long mask write times. While a majority of the industry is willing to accept times of up to 24 hours, evidence suggests that the write times for many masks at the 22 nm node and beyond will be significantly longer. It has been estimated that funding on the order of 50M to 90M for non-recurring engineering (NRE) costs will be required to develop a multiple beam mask writer system, yet the business case to recover this kind of investment is not strong. Moreover, funding such a development poses a high risk for an individual supplier. The structure of the mask fabrication marketplace separates the mask writer equipment customer (the mask supplier) from the final customer (wafer manufacturer) that will be most effected by the increase in mask cost that will result if a high speed mask writer is not available. Since no individual company will likely risk entering this market, some type of industry-wide funding model will be needed.

  18. Shadows Alter Facial Expressions of Noh Masks

    PubMed Central

    Kawai, Nobuyuki; Miyata, Hiromitsu; Nishimura, Ritsuko; Okanoya, Kazuo

    2013-01-01

    Background A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers’ recognition of the emotional expressions. Methodology/Principal Findings In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. Conclusions/Significance Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa’s smile. They also agree with the aesthetic principle of Japanese traditional art “yugen (profound grace and subtlety)”, which highly appreciates subtle emotional expressions in the darkness. PMID:23940748

  19. Masking Technique for Ion-Beam Sputter Etching

    NASA Technical Reports Server (NTRS)

    Banks, B. A.; Rutledge, S. K.

    1986-01-01

    Improved process for fabrication of integrated circuits developed. Technique utilizes simultaneous ion-beam sputter etching and carbon sputter deposition in conjunction with carbon sputter mask or organic mask decomposed to produce carbon-rich sputter-mask surface. Sputter etching process replenishes sputter mask with carbon to prevent premature mask loss.

  20. 42 CFR 84.117 - Gas mask containers; minimum requirements.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 42 Public Health 1 2011-10-01 2011-10-01 false Gas mask containers; minimum requirements. 84.117... § 84.117 Gas mask containers; minimum requirements. (a) Gas masks shall be equipped with a substantial... mask it contains and all appropriate approval labels. (b) Containers for gas masks shall be...

  1. 42 CFR 84.117 - Gas mask containers; minimum requirements.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 42 Public Health 1 2012-10-01 2012-10-01 false Gas mask containers; minimum requirements. 84.117... § 84.117 Gas mask containers; minimum requirements. (a) Gas masks shall be equipped with a substantial... mask it contains and all appropriate approval labels. (b) Containers for gas masks shall be...

  2. 42 CFR 84.117 - Gas mask containers; minimum requirements.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 42 Public Health 1 2014-10-01 2014-10-01 false Gas mask containers; minimum requirements. 84.117... § 84.117 Gas mask containers; minimum requirements. (a) Gas masks shall be equipped with a substantial... mask it contains and all appropriate approval labels. (b) Containers for gas masks shall be...

  3. 42 CFR 84.117 - Gas mask containers; minimum requirements.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 42 Public Health 1 2013-10-01 2013-10-01 false Gas mask containers; minimum requirements. 84.117... § 84.117 Gas mask containers; minimum requirements. (a) Gas masks shall be equipped with a substantial... mask it contains and all appropriate approval labels. (b) Containers for gas masks shall be...

  4. 42 CFR 84.110 - Gas masks; description.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 42 Public Health 1 2013-10-01 2013-10-01 false Gas masks; description. 84.110 Section 84.110... HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.110 Gas masks; description. (a) Gas masks including all completely assembled air purifying masks designed...

  5. 42 CFR 84.110 - Gas masks; description.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 42 Public Health 1 2012-10-01 2012-10-01 false Gas masks; description. 84.110 Section 84.110... HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.110 Gas masks; description. (a) Gas masks including all completely assembled air purifying masks designed...

  6. Precision spectroscopy of Helium

    SciTech Connect

    Cancio, P.; Giusfredi, G.; Mazzotti, D.; De Natale, P.; De Mauro, C.; Krachmalnicoff, V.; Inguscio, M.

    2005-05-05

    Accurate Quantum-Electrodynamics (QED) tests of the simplest bound three body atomic system are performed by precise laser spectroscopic measurements in atomic Helium. In this paper, we present a review of measurements between triplet states at 1083 nm (23S-23P) and at 389 nm (23S-33P). In 4He, such data have been used to measure the fine structure of the triplet P levels and, then, to determine the fine structure constant when compared with equally accurate theoretical calculations. Moreover, the absolute frequencies of the optical transitions have been used for Lamb-shift determinations of the levels involved with unprecedented accuracy. Finally, determination of the He isotopes nuclear structure and, in particular, a measurement of the nuclear charge radius, are performed by using hyperfine structure and isotope-shift measurements.

  7. Superfluid Helium Heat Pipe

    NASA Astrophysics Data System (ADS)

    Gully, P.

    This paper reports on the development and the thermal tests of three superfluid helium heat pipes. Two of them are designed to provide a large transport capacity (4 mW at 1.7 K). They feature a copper braid located inside a 6 mm outer diameter stainless tube fitted with copper ends for mechanical anchoring. The other heat pipe has no copper braid and is designed to get much smaller heat transport capacity (0.5 mW) and to explore lower temperature (0.7 - 1 K). The copper braid and the tube wall is the support of the Rollin superfluid helium film in which the heat is transferred. The low filling pressure makes the technology very simple with the possibility to easily bend the tube. We present the design and discuss the thermal performance of the heat pipes tested in the 0.7 to 2.0 K temperature range. The long heat pipe (1.2 m with copper braid) and the short one (0.25 m with copper braid) have similar thermal performance in the range 0.7 - 2.0 K. At 1.7 K the long heat pipe, 120 g in weight, reaches a heat transfer capacity of 6.2 mW and a thermal conductance of 600 mW/K for 4 mW transferred power. Due to the pressure drop of the vapor flow and Kapitza thermal resistance, the conductance of the third heat pipe dramatically decreases when the temperature decreases. A 3.8 mW/K is obtained at 0.7 K for 0.5 mW transferred power.

  8. Implicit Semantic Perception in Object Substitution Masking

    ERIC Educational Resources Information Center

    Goodhew, Stephanie C.; Visser, Troy A. W.; Lipp, Ottmar V.; Dux, Paul E.

    2011-01-01

    Decades of research on visual perception has uncovered many phenomena, such as binocular rivalry, backward masking, and the attentional blink, that reflect "failures of consciousness". Although stimuli do not reach awareness in these paradigms, there is evidence that they nevertheless undergo semantic processing. Object substitution masking (OSM),…

  9. 47 CFR 90.210 - Emission masks.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... 47 Telecommunication 5 2010-10-01 2010-10-01 false Emission masks. 90.210 Section 90.210 Telecommunication FEDERAL COMMUNICATIONS COMMISSION (CONTINUED) SAFETY AND SPECIAL RADIO SERVICES PRIVATE LAND MOBILE RADIO SERVICES General Technical Standards § 90.210 Emission masks. Except as indicated elsewhere in this part, transmitters used in...

  10. 21 CFR 868.5570 - Nonrebreathing mask.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask....

  11. 21 CFR 868.5590 - Scavenging mask.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 8 2012-04-01 2012-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification....

  12. 21 CFR 868.5590 - Scavenging mask.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 8 2014-04-01 2014-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification....

  13. 21 CFR 868.5570 - Nonrebreathing mask.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 8 2014-04-01 2014-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask....

  14. 21 CFR 868.5570 - Nonrebreathing mask.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 8 2012-04-01 2012-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask....

  15. 21 CFR 868.5590 - Scavenging mask.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification....

  16. 21 CFR 868.5570 - Nonrebreathing mask.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask....

  17. 21 CFR 868.5590 - Scavenging mask.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification....

  18. 21 CFR 868.5590 - Scavenging mask.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification....

  19. 21 CFR 868.5570 - Nonrebreathing mask.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask....

  20. GEWEX-RFA Land-Ocean Mask

    Atmospheric Science Data Center

    2016-05-20

    GEWEX RFA Land-Ocean Mask A 2.5° resolution land-ocean mask has been developed for the Radiative Flux Assessment. It can be used ... creating global, regional, or zonal time series for land or ocean. Format - Pixels are arranged as in global map standard . ...

  1. A facial mask comprising Dead Sea mud.

    PubMed

    Abu-Jdayil, Basim; Mohameed, Hazim A

    2006-01-01

    Many investigators have proved that Dead Sea salt and mud are useful in treating skin disorders and skin diseases. Therefore, the black mud has been extensively used as a base for the preparation of soaps, creams, and unguents for skin care. This study concerns a facial mask made mainly of Dead Sea mud. The effects of temperature and shearing conditions on the rheological behavior of the facial mask were investigated. The mud facial mask exhibited a shear thinning behavior with a yield stress. It was found that the apparent viscosity of the mask has a strong dependence on the shear rate as well as on the temperature. The facial mask exhibited a maximum yield stress and very shear thinning behavior at 40 degrees C, which is attributed to the gelatinization of the polysaccharide used to stabilize the mud particles. On the other hand, the mud mask exhibited a time-independent behavior at low temperatures and shear rates and changed to a thixotropic behavior upon increasing both the temperature and the shear rate. The shear thinning and thixotropic behaviors have a significant importance in the ability of the facial mask to spread on the skin: the Dead Sea mud mask can break down for easy spreading, and the applied film can gain viscosity instantaneously to resist running. Moreover, particle sedimentation, which in this case would negatively affect consumer acceptance of the product, occurs slowly due to high viscosity at rest conditions. PMID:17256074

  2. Masking the Feeling of Being Stupid.

    ERIC Educational Resources Information Center

    Smith, Sally L.

    1988-01-01

    Teaching experience at The Lab School of Washington has shown that learning-disabled children and adults cope with their lack of self-esteem and feelings of stupidity by developing masks to hide their hurt. These include masks of super-competence, helplessness, invisibility, clowning, injustice collecting, indifference, boredom, outrageousness,…

  3. Mask industry assessment trend analysis 2006

    NASA Astrophysics Data System (ADS)

    Shelden, Gilbert; Marmillion, Patricia

    2007-02-01

    Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. This year's survey data was presented at BACUS and a detailed trend analysis is presented here. The annual survey is designed with the input of semiconductor company mask technologists, merchant mask suppliers and industry equipment makers. This year's assessment is the fifth in the current series of annual reports. With continued industry support the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify trends in the mask industry. The results will be used to guide future investments on critical path issues. This year's survey is basically the same as the 2005 survey. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss, Mechanisms, Delivery Times, Returns and Services, Operating Cost Factors, and Equipment Utilization. Within each category is a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry. Note: the questions covering operating cost factors and equipment utilization were only added to the survey in 2005; therefore meaningful trend analysis is not yet available.

  4. Mask industry assessment trend analysis: 2010

    NASA Astrophysics Data System (ADS)

    Hughes, Greg; Yun, Henry

    2010-05-01

    Microelectronics industry leaders consistently cite the cost and cycle time of mask technology and mask supply as top critical issues. A survey was designed with input from semiconductor company mask technologists and merchant mask suppliers and support from SEMATECH to gather information about the mask industry as an objective assessment of its overall condition. This year's assessment was the eighth in the current series of annual reports. Its data were presented in detail at BACUS, and the detailed trend analysis is presented at EMLC. With continued industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. Its results will be used to guide future investments on critical path issues. This year's survey is basically the same as the surveys in 2005 through 2009. Questions are grouped into six categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category is a multitude of questions that creates a detailed profile of both the business and technical status of the critical mask industry.

  5. Computing Challenges in Coded Mask Imaging

    NASA Technical Reports Server (NTRS)

    Skinner, Gerald

    2009-01-01

    This slide presaentation reviews the complications and challenges in developing computer systems for Coded Mask Imaging telescopes. The coded mask technique is used when there is no other way to create the telescope, (i.e., when there are wide fields of view, high energies for focusing or low energies for the Compton/Tracker Techniques and very good angular resolution.) The coded mask telescope is described, and the mask is reviewed. The coded Masks for the INTErnational Gamma-Ray Astrophysics Laboratory (INTEGRAL) instruments are shown, and a chart showing the types of position sensitive detectors used for the coded mask telescopes is also reviewed. Slides describe the mechanism of recovering an image from the masked pattern. The correlation with the mask pattern is described. The Matrix approach is reviewed, and other approaches to image reconstruction are described. Included in the presentation is a review of the Energetic X-ray Imaging Survey Telescope (EXIST) / High Energy Telescope (HET), with information about the mission, the operation of the telescope, comparison of the EXIST/HET with the SWIFT/BAT and details of the design of the EXIST/HET.

  6. A mask manufacturer's perspective on maskless lithography

    NASA Astrophysics Data System (ADS)

    Buck, Peter; Biechler, Charles; Kalk, Franklin

    2005-11-01

    Maskless Lithography (ML2) is again being considered for use in mainstream CMOS IC manufacturing. Sessions at technical conferences are being devoted to ML2. A multitude of new companies have been formed in the last several years to apply new concepts to breaking the throughput barrier that has in the past prevented ML2 from achieving the cost and cycle time performance necessary to become economically viable, except in rare cases. Has Maskless Lithography's (we used to call it "Direct Write Lithography") time really come? If so, what is the expected impact on the mask manufacturer and does it matter? The lithography tools used today in mask manufacturing are similar in concept to ML2 except for scale, both in throughput and feature size. These mask tools produce highly accurate lithographic images directly from electronic pattern files, perform multi-layer overlay, and mix-n-match across multiple tools, tool types and sites. Mask manufacturers are already accustomed to the ultimate low volume - one substrate per design layer. In order to achieve the economically required throughput, proposed ML2 systems eliminate or greatly reduce some of the functions that are the source of the mask writer's accuracy. Can these ML2 systems meet the demanding lithographic requirements without these functions? ML2 may eliminate the reticle but many of the processes and procedures performed today by the mask manufacturer are still required. Examples include the increasingly complex mask data preparation step and the verification performed to ensure that the pattern on the reticle is accurately representing the design intent. The error sources that are fixed on a reticle are variable with time on an ML2 system. It has been proposed that if ML2 is successful it will become uneconomical to be in the mask business - that ML2, by taking the high profit masks will take all profitability out of mask manufacturing and thereby endanger the entire semiconductor industry. Others suggest that a

  7. Helium-ion-induced release of hydrogen from graphite

    SciTech Connect

    Langley, R.A.

    1987-01-01

    The ion-induced release of hydrogen from AXF-5Q graphite was studied for 350-eV helium ions. The hydrogen was implanted into the graphite with a low energy (approx.200 eV) and to a high fluence. This achieved a thin (approx.10-nm), saturated near-surface region. The release of hydrogen was measured as a function of helium fluence. A model that includes ion-induced detrapping, retrapping, and surface recombination was used to analyze the experimental data. A value of (1.65 +- 0.2) x 10/sup -16/ cm/sup 2/ was obtained from the detrapping cross section, and a value of (0.5 to 4) x 10/sup -14/ cm/sup 4//atoms was obtained for the recombination coefficient. 11 refs., 4 figs.

  8. Resource Letter SH-1: Superfluid Helium.

    ERIC Educational Resources Information Center

    Hallock, Robert B.

    1982-01-01

    Provides an annotated list of books, textbooks, and films on superfluid helium. Also lists research reports/reviews arranged by category, including among others, early history, microscopic understanding, ions in helium, helium in rotation, vortices and quantization, helium films and constricted geometrics, persistence flow, and superfluid helium…

  9. Evaluation of the efficiency of medical masks and the creation of new medical masks.

    PubMed

    Huang, J T; Huang, V I

    2007-01-01

    The effectiveness of medical masks in preventing respiratory infection was investigated by testing bacterial leakage, filtration efficiency, respiratory resistance and oxygen concentration of the enclosed space. Polypropylene (PP) fibres were treated with dimethyldioctadecylammonium bromide to impart a positive electrical charge capable of attracting bacteria. The fluffed PP fibres were used to make a polypropylene mask and to edge standard surgical and N-95 respirators to prevent leakage. A PP napkin was created by melting and blowing PP. The PP edging seal dramatically reduced bacterial leakage of standard masks and was more effective than adhesive paper tape edging in reducing respiratory resistance. Bacterial or viral filtration efficiency was almost 100% for the PP mask and the PP napkin. The specially designed PP mask with a synthetic adhesive at the edge of the mask may be more effective than the standard surgical mask and the N-95 respirator. The PP napkin is an important tool in preventing the spread of pathogens. PMID:17542408

  10. Influence of displacement damage on deuterium and helium retention in austenitic and ferritic-martensitic alloys considered for ADS service

    NASA Astrophysics Data System (ADS)

    Voyevodin, V. N.; Karpov, S. A.; Kopanets, I. E.; Ruzhytskyi, V. V.; Tolstolutskaya, G. D.; Garner, F. A.

    2016-01-01

    The behavior of ion-implanted hydrogen (deuterium) and helium in austenitic 18Cr10NiTi stainless steel, EI-852 ferritic steel and ferritic/martensitic steel EP-450 and their interaction with displacement damage were investigated. Energetic argon irradiation was used to produce displacement damage and bubble formation to simulate nuclear power environments. The influence of damage morphology and the features of radiation-induced defects on deuterium and helium trapping in structural alloys was studied using ion implantation, the nuclear reaction D(3He,p)4He, thermal desorption spectrometry and transmission electron microscopy. It was found in the case of helium irradiation that various kinds of helium-radiation defect complexes are formed in the implanted layer that lead to a more complicated spectra of thermal desorption. Additional small changes in the helium spectra after irradiation with argon ions to a dose of ≤25 dpa show that the binding energy of helium with these traps is weakly dependent on the displacement damage. It was established that retention of deuterium in ferritic and ferritic-martensitic alloys is three times less than in austenitic steel at damage of ˜1 dpa. The retention of deuterium in steels is strongly enhanced by presence of radiation damages created by argon ion irradiation, with a shift in the hydrogen release temperature interval of 200 K to higher temperature. At elevated temperatures of irradiation the efficiency of deuterium trapping is reduced by two orders of magnitude.

  11. Plasma immersion ion implantation for silicon processing

    NASA Astrophysics Data System (ADS)

    Yankov, Rossen A.; Mändl, Stephan

    2001-04-01

    Plasma Immersion Ion Implantation (PIII) is a technology which is currently widely investigated as an alternative to conventional beam line implantation for ultrashallow doping beyond the 0.15 m technology. However, there are several other application areas in modern semiconductor processing. In this paper a detailed discussion of the PIII process for semiconductors and of actual as well as future applications is given. Besides the well known advantages of PIII - fast process, implantation of the whole surface, low cost of ownership - several peculiarities - like spread of the implantation energy due to finite rise time or collisions, no mass separation, high secondary electron emission - must be mentioned. However, they can be overcome by adjusting the system and the process parameters. Considering the applications, ultrashallow junction formation by PIII is an established industrial process, whereas SIMOX and Smart-Cut by oxygen and hydrogen implantation are current topics between research and introduction into industry. Further applications of PIII, of which some already are research topics and some are only investigated by conventional ion implantation, include seeding for metal deposition, gettering of metal impurities, etch stop layers and helium implantation for localized lifetime control.

  12. Wearable Monitor Helps Spot 'Masked' High Blood Pressure

    MedlinePlus

    ... fullstory_158860.html Wearable Monitor Helps Spot 'Masked' High Blood Pressure Black people with undetected problem twice as likely ... doctors spot black people with "masked," or undetected, high blood pressure, a new study suggests. "Masked" high blood pressure ...

  13. Cheap Face Masks Little Help Against Air Pollutants

    MedlinePlus

    ... News) -- Inexpensive cloth masks offer little protection against air pollution, a new study suggests. Many people in Asia ... or washable cloth masks to protect against small air pollution particles. But tests on different types of masks ...

  14. Interactions of mobile helium clusters with surfaces and grain boundaries of plasma-exposed tungsten

    SciTech Connect

    Hu, Lin; Maroudas, Dimitrios; Hammond, Karl D.; Wirth, Brian D.

    2014-05-07

    We report results of atomistic computations for the interactions of small mobile helium clusters (He{sub n}) with free surfaces and grain boundaries (GBs) in tungsten toward development of continuum drift-diffusion-reaction models for the dynamics of mobile helium clusters in plasma-exposed tungsten. Molecular-statics (MS) simulations based on reliable many-body interatomic potentials are carried out for He{sub n} (1 ≤ n ≤ 7) clusters near sinks to obtain the potential energy profiles of the He{sub n} clusters as a function of the clusters' center-of-mass distance from a sink. Sinks investigated include surfaces, GBs, and regions in the vicinity of junctions where GBs intersect free surfaces. Elastic interaction potentials based on elastic inclusion theory provide an excellent description of the MS results for the cluster-sink interactions. The key parameter in the elastic models is the sink segregation strength, which is found to increase with increasing cluster size. Such cluster-sink interactions are responsible for the migration of small helium clusters by drift and for helium segregation on surfaces and grain boundaries in tungsten. Such helium segregation on sinks is observed in large-scale molecular-dynamics simulations of helium aggregation in model polycrystalline tungsten at 933 K upon helium implantation.

  15. Impact of photolithography and mask variability on interconnect parasitics

    NASA Astrophysics Data System (ADS)

    Tian, Yuxin; Shi, Weiping; Mercer, M. Ray

    2005-11-01

    Due to photolithography effects and manufacture process variations, the actual features printed on wafer are different from the designed ones. This difference results in the inaccuracy on parasitic extraction, which is critical for timing verification and design for manufacturability. Most of the current layout parasitic extraction (LPE) tools ignore these effects and can cause as high as 20% errors. This paper proposes a new strategy to extract interconnect parasitics with the consideration of photolithography effects and process variations. Based on the feedback from lithography simulation, a shape correction process is setup to adjust the interconnect structure for LPE tools. Compared with the traditional extraction methodology, the parasitics extracted from this adjusted geometry are more accurate. This method can be implanted into the current design flow with minimum change. Meanwhile, this paper studies the impacts of mask critical dimension (CD) variations on interconnect parasitics. The variability analysis is based on PROLITH lithography simulation software and is tested on RAPHAEL interconnect library. The results show a high nonlinear relationship between the mask variation and the interconnect parasitics.

  16. Nasal mask ventilation is better than face mask ventilation in edentulous patients

    PubMed Central

    Kapoor, Mukul Chandra; Rana, Sandeep; Singh, Arvind Kumar; Vishal, Vindhya; Sikdar, Indranil

    2016-01-01

    Background and Aims: Face mask ventilation of the edentulous patient is often difficult as ineffective seating of the standard mask to the face prevents attainment of an adequate air seal. The efficacy of nasal ventilation in edentulous patients has been cited in case reports but has never been investigated. Material and Methods: Consecutive edentulous adult patients scheduled for surgery under general anesthesia with endotracheal intubation, during a 17-month period, were prospectively evaluated. After induction of anesthesia and administration of neuromuscular blocker, lungs were ventilated with a standard anatomical face mask of appropriate size, using a volume controlled anesthesia ventilator with tidal volume set at 10 ml/kg. In case of inadequate ventilation, the mask position was adjusted to achieve best-fit. Inspired and expired tidal volumes were measured. Thereafter, the face mask was replaced by a nasal mask and after achieving best-fit, the inspired and expired tidal volumes were recorded. The difference in expired tidal volumes and airway pressures at best-fit with the use of the two masks and number of patients with inadequate ventilation with use of the masks were statistically analyzed. Results: A total of 79 edentulous patients were recruited for the study. The difference in expiratory tidal volumes with the use of the two masks at best-fit was statistically significant (P = 0.0017). Despite the best-fit mask placement, adequacy of ventilation could not be achieved in 24.1% patients during face mask ventilation, and 12.7% patients during nasal mask ventilation and the difference was statistically significant. Conclusion: Nasal mask ventilation is more efficient than standard face mask ventilation in edentulous patients. PMID:27625477

  17. Masking property of quantum random cipher with phase mask encryption

    NASA Astrophysics Data System (ADS)

    Sohma, Masaki; Hirota, Osamu

    2014-10-01

    The security analysis of physical encryption protocol based on coherent pulse position modulation (CPPM) originated by Yuen is one of the most interesting topics in the study of cryptosystem with a security level beyond the Shannon limit. Although the implementation of CPPM scheme has certain difficulty, several methods have been proposed recently. This paper deals with the CPPM encryption in terms of symplectic transformation, which includes a phase mask encryption as a special example, and formulates a unified security analysis for such encryption schemes. Specifically, we give a lower bound of Eve's symbol error probability using reliability function theory to ensure that our proposed system exceeds the Shannon limit. Then we assume the secret key is given to Eve after her heterodyne measurement. Since this assumption means that Eve has a great advantage in the sense of the conventional cryptography, the lower bound of her error indeed ensures the security level beyond the Shannon limit. In addition, we show some numerical examples of the security performance.

  18. Low temperature uses of helium

    NASA Technical Reports Server (NTRS)

    Brown, G. V.

    1970-01-01

    Helium is used for purging and pressurizing cryogenic rocket propellants, welding, atmosphere control, leak detection, and refrigeration. It provides the lowest possible liquid-bath temperature and produces superconductivity in certain materials. Its superfluid effects are used in superconducting magnets.

  19. Radiation source for helium magnetometers

    NASA Technical Reports Server (NTRS)

    Slocum, Robert E. (Inventor)

    1991-01-01

    A radiation source (12) for optical magnetometers (10) which use helium isotopes as the resonance element (30) includes an electronically pumped semiconductor laser (12) which produces a single narrow line of radiation which is frequency stabilized to the center frequency of the helium resonance line to be optically pumped. The frequency stabilization is accomplished using electronic feedback (34, 40, 42, 44) to control a current sources (20) thus eliminating the need for mechanical frequency tuning.

  20. Global image placement of LEEPL mask

    NASA Astrophysics Data System (ADS)

    Eguchi, Hideyuki; Susa, Takashi; Sumida, Tomoya; Kurosu, Toshiaki; Yoshii, Takashi; Yotsui, Kenta; Sugimura, Hiroshi; Itoh, Kojiro; Tamura, Akira

    2004-12-01

    Two types of strut-supported low energy electron-beam proximity projection lithography (LEEPL) masks which are grid-type mask and COSMOS-type mask, were investigated for Global image placement (IP). First, we evaluated the dynamic repeatability measurement performance for global IP, measuring a same mask 10 times on a 46 x 46 mm pattern area by using LEEPL electrostatic chuck (ESC). The measurement repeatability for grid type and COSMOS type were 5.1/7.8 nm and 4.4/5.8 nm in x/y directions respectively. And then global in-plane distortion (IPD) of COSMOS type masks with various stress and flatness were measured. The global IPD of a COSMOS-type mask with a low stress of 10 MPa and a flatness of 3.1 μm was 6.5/6.4 nm in x/y directions, which is negligible assuming the measurement repeatability. Finally the global IPs of the two-type masks were measured. The global IPs for the grid-type and COSMOS-type were 24.5/15.7 nm and 23.2/16.4 nm in x/y directions respectively. Thus we confirmed that the global IP obtained meet the required value of less than 30 nm.

  1. LCD masks for spatial augmented reality

    NASA Astrophysics Data System (ADS)

    Smithwick, Quinn Y. J.; Reetz, Daniel; Smoot, Lanny

    2014-03-01

    One aim of Spatial Augmented Reality is to visually integrate synthetic objects into real-world spaces amongst physical objects, viewable by many observers without 3D glasses, head-mounted displays or mobile screens. In common implementations, using beam-combiners, scrim projection, or transparent self-emissive displays, the synthetic object's and real-world scene's light combine additively. As a result, synthetic objects appear low-contrast and semitransparent against well-lit backgrounds, and do not cast shadows. These limitations prevent synthetic objects from appearing solid and visually integrated into the real-world space. We use a transparent LCD panel as a programmable dynamic mask. The LCD panel displaying the synthetic object's silhouette mask is colocated with the object's color image, both staying aligned for all points-of-view. The mask blocks the background providing occlusion, presents a black level for high-contrast images, blocks scene illumination thus casting true shadows, and prevents blow-by in projection scrim arrangements. We have several implementations of SAR with LCD masks: 1) beam-combiner with an LCD mask, 2) scrim projection with an LCD mask, and 3) transparent OLED display with an LCD mask. Large format (80" diagonal) and dual layer volumetric variations are also implemented.

  2. An interactive tool for gamut masking

    NASA Astrophysics Data System (ADS)

    Song, Ying; Lau, Cheryl; Süsstrunk, Sabine

    2014-02-01

    Artists often want to change the colors of an image to achieve a particular aesthetic goal. For example, they might limit colors to a warm or cool color scheme to create an image with a certain mood or feeling. Gamut masking is a technique that artists use to limit the set of colors they can paint with. They draw a mask over a color wheel and only use the hues within the mask. However, creating the color palette from the mask and applying the colors to the image requires skill. We propose an interactive tool for gamut masking that allows amateur artists to create an image with a desired mood or feeling. Our system extracts a 3D color gamut from the 2D user-drawn mask and maps the image to this gamut. The user can draw a different gamut mask or locally refine the image colors. Our voxel grid gamut representation allows us to represent gamuts of any shape, and our cluster-based image representation allows the user to change colors locally.

  3. Reflective masks for extreme ultraviolet lithography

    SciTech Connect

    Nguyen, Khanh Bao

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 {mu}m wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  4. The Sensitivity of Coded Mask Telescopes

    NASA Technical Reports Server (NTRS)

    Skinner, Gerald K.

    2008-01-01

    Simple formulae are often used to estimate the sensitivity of coded mask X-ray or gamma-ray telescopes, but t,hese are strictly only applicable if a number of basic assumptions are met. Complications arise, for example, if a grid structure is used to support the mask elements, if the detector spatial resolution is not good enough to completely resolve all the detail in the shadow of the mask or if any of a number of other simplifying conditions are not fulfilled. We derive more general expressions for the Poisson-noise-limited sensitivity of astronomical telescopes using the coded mask technique, noting explicitly in what circumstances they are applicable. The emphasis is on using nomenclature and techniques that result in simple and revealing results. Where no convenient expression is available a procedure is given which allows the calculation of the sensitivity. We consider certain aspects of the optimisation of the design of a coded mask telescope and show that when the detector spatial resolution and the mask to detector separation are fixed, the best source location accuracy is obtained when the mask elements are equal in size to the detector pixels.

  5. Mask industry assessment trend analysis: 2012

    NASA Astrophysics Data System (ADS)

    Chan, Y. David

    2012-02-01

    Microelectronics industry leaders consistently cite the cost and cycle time of mask technology and mask supply among the top critical issues for lithography. A survey was designed by SEMATECH with input from semiconductor company mask technologists and merchant mask suppliers to objectively assess the overall conditions of the mask industry. With the continued support of the industry, this year's assessment was the tenth in the current series of annual reports. This year's survey is basically the same as the 2005 through 2011 surveys. Questions are grouped into six categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category is a multitude of questions that ultimately produce a detailed profile of both the business and technical status of the critical mask industry. We received data from 11 companies this year, which was a record high since the beginning of the series. The responding companies represented more than 96% of the volume shipped and about 90% of the 2011 revenue for the photomask industry. These survey reports are often used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. They will continue to serve as a valuable reference to identify strengths and opportunities. Results can also be used to guide future investments in critical path issues.

  6. ITER helium ash accumulation

    SciTech Connect

    Hogan, J.T.; Hillis, D.L.; Galambos, J.; Uckan, N.A. ); Dippel, K.H.; Finken, K.H. . Inst. fuer Plasmaphysik); Hulse, R.A.; Budny, R.V. . Plasma Physics Lab.)

    1990-01-01

    Many studies have shown the importance of the ratio {upsilon}{sub He}/{upsilon}{sub E} in determining the level of He ash accumulation in future reactor systems. Results of the first tokamak He removal experiments have been analysed, and a first estimate of the ratio {upsilon}{sub He}/{upsilon}{sub E} to be expected for future reactor systems has been made. The experiments were carried out for neutral beam heated plasmas in the TEXTOR tokamak, at KFA/Julich. Helium was injected both as a short puff and continuously, and subsequently extracted with the Advanced Limiter Test-II pump limiter. The rate at which the He density decays has been determined with absolutely calibrated charge exchange spectroscopy, and compared with theoretical models, using the Multiple Impurity Species Transport (MIST) code. An analysis of energy confinement has been made with PPPL TRANSP code, to distinguish beam from thermal confinement, especially for low density cases. The ALT-II pump limiter system is found to exhaust the He with maximum exhaust efficiency (8 pumps) of {approximately}8%. We find 1<{upsilon}{sub He}/{upsilon}{sub E}<3.3 for the database of cases analysed to date. Analysis with the ITER TETRA systems code shows that these values would be adequate to achieve the required He concentration with the present ITER divertor He extraction system.

  7. Electron beam EUV patterned mask inspection system

    NASA Astrophysics Data System (ADS)

    Yamada, Keizo; Kitayama, Yasunobu; Fiekowsky, Peter

    2011-11-01

    EUV lithography is expected to begin production in 2014. Production of successful EUV photomasks requires patterned mask inspection (PMI). The ultimate PMI tool is expected to utilize actinic (EUV) illumination. Development of such a tool is expected to require three years after funding. Current test EUV masks, such as 22 nm, can be inspected using 193 nm wavelength deep UV (DUV) inspection tools similar to those currently being used for DUV masks. The DUV inspection tools may be extended for the 16 nm node. However EUV production is expected to start with 11 nm node masks which cannot be inspected with proposed DUV inspection tools. Therefore E-beam inspection (EBI) is discussed as the interim PMI method. EBI has the advantage of high resolution and the disadvantages of low inspection speed and relative insensitivity to ML defects (in the multi-layer material). EBI inspection speed is limited by the pixel size, pixel capture rate and the number of electron columns. The pixel rate is limited by the detector time-resolution, the beam current, and the detection efficiency. Technical improvements in beam focus, secondary electron detection, and defect detection and analysis provide good performance for 22 nm node masks. We discuss the advances and show that performance can be extrapolated for 16 and 11 nm node patterned mask inspections. We present sensitivity and false-defect frequency results of using the Holon EBI tool on 22 nm test masks and a roadmap for extending its operation for use on 16 and 11 nm node masks for inspections requiring 2-5 hours per mask.

  8. Crystal orientation effects on helium ion depth distributions and adatom formation processes in plasma-facing tungsten

    SciTech Connect

    Hammond, Karl D.; Wirth, Brian D.

    2014-10-14

    We present atomistic simulations that show the effect of surface orientation on helium depth distributions and surface feature formation as a result of low-energy helium plasma exposure. We find a pronounced effect of surface orientation on the initial depth of implanted helium ions, as well as a difference in reflection and helium retention across different surface orientations. Our results indicate that single helium interstitials are sufficient to induce the formation of adatom/substitutional helium pairs under certain highly corrugated tungsten surfaces, such as (1 1 1)-orientations, leading to the formation of a relatively concentrated layer of immobile helium immediately below the surface. The energies involved for helium-induced adatom formation on (1 1 1) and (2 1 1) surfaces are exoergic for even a single adatom very close to the surface, while (0 0 1) and (0 1 1) surfaces require two or even three helium atoms in a cluster before a substitutional helium cluster and adatom will form with reasonable probability. This phenomenon results in much higher initial helium retention during helium plasma exposure to (1 1 1) and (2 1 1) tungsten surfaces than is observed for (0 0 1) or (0 1 1) surfaces and is much higher than can be attributed to differences in the initial depth distributions alone. The layer thus formed may serve as nucleation sites for further bubble formation and growth or as a source of material embrittlement or fatigue, which may have implications for the formation of tungsten “fuzz” in plasma-facing divertors for magnetic-confinement nuclear fusion reactors and/or the lifetime of such divertors.

  9. Next-generation lithography mask inspection

    NASA Astrophysics Data System (ADS)

    Bareket, Noah; Biellak, Steve; Pettibone, Donald W.; Stokowski, Stanley E.

    2000-07-01

    KLA-Tencor and industry partners are collaborating on a project for developing early capabilities of inspecting NGL masks. The project, partially funded by NIST as part of the ATP program, is focusing on building a research tool that will provide experimental data for development of a production capable tool. Some of the key technical issues include contrast in transmission and reflection, defect sources and types, and maintaining mask cleanliness in the absence of pellicles. The masks need to be inspected at multiple process stages, starting with unpatterned substrates, and ending with the pattern inspection. System issues include defect sensitivity and inspection time, which need to be balanced.

  10. Actinic review of EUV masks

    NASA Astrophysics Data System (ADS)

    Feldmann, Heiko; Ruoff, Johannes; Harnisch, Wolfgang; Kaiser, Winfried

    2010-04-01

    Management of mask defects is a major challenge for the introduction of EUV for HVM production. Once a defect has been detected, its printing impact needs to be predicted. Potentially the defect requires some repair, the success of which needs to be proven. This defect review has to be done with an actinic inspection system that matches the imaging conditions of an EUV scanner. During recent years, several concepts for such an aerial image metrology system (AIMS™) have been proposed. However, until now no commercial solution exists for EUV. Today, advances in EUV optics technology allow envisioning a solution that has been discarded before as unrealistic. We present this concept and its technical cornerstones.While the power requirement for the EUV source is less demanding than for HVM lithography tools, radiance, floor space, and stability are the main criteria for source selection. The requirement to emulate several generations of EUV scanners demands a large flexibility for the ilumination and imaging systems. New critical specifications to the EUV mirrors in the projection microscope can be satisfied using our expertise from lithographic mirrors. In summary, an EUV AIMS™ meeting production requirements seems to be feasible.

  11. When Bad Masks Turn Good

    NASA Astrophysics Data System (ADS)

    Abraham, Roberto G.

    In keeping with the spirit of a meeting on ‘masks,' this talk presents two short stories on the theme of dust. In the first, dust plays the familiar role of the evil obscurer, the enemy to bedefeated by the cunning observer in order to allow a key future technology (adaptive optics) to be exploited fully by heroic astronomers. In the second story, dust itself emerges as the improbable hero, in the form of a circumstellar debris disks. I will present evidence of a puzzling near-infrared excess in the continuum of high-redshift galaxies and will argue that the seemingly improbable origin of this IR excess is a population of young circumstellar disks formed around high-mass stars in distant galaxies. Assuming circumstellar disks extend down to lower masses,as they do in our own Galaxy, the excess emission presents us with an exciting opportunity to measure the formation rate of planetary systems in distant galaxies at cosmic epochs before our own solar system formed.

  12. Masked PDAMNA Film On Glass

    NASA Technical Reports Server (NTRS)

    1996-01-01

    Polydiacetylenes are a unique class of highly conjugated organic polymers that are of interest for both electronic and photonic applications. Photodeposition from solutions is a novel process superior to those grown by conventional techniques. Evidence of this is seen when the films are viewed under a microscope; they exhibit small particles of solid polymer which form in the bulk solution, get transported by convection to the surface of the growing film, and become embedded. Also convection tends to cause the film thickness to be less uniform, and may even affect the molecular orientation of the films. The thrust of the research is to investigate in detail, both in 1-g and low-g, the effects of convection (and lack thereof) on this novel and interesting reaction. In this example, a portion of the substrate was blocked from exposure to the UV light by the mask, which was placed on the opposite side of the glass disk as the film, clearly demonstrating that photodeposition occurs only where the substrate is irradiated directly.

  13. Cochlear Implants

    MedlinePlus

    ... outside of the body, behind the ear. A second part is surgically placed under the skin. An implant does not restore normal hearing. It can help a person understand speech. Children and adults can benefit from them. National Institute on Deafness and Other Communication Disorders

  14. Cochlear implant

    MedlinePlus

    ... are sent along the auditory nerve to the brain. A deaf person does not have a functioning inner ear. A cochlear implant tries to replace the function of the inner ear by ... signals to the brain. Sound is picked up by a microphone worn ...

  15. Investigation of EUV haze defect: molecular behaviors of mask cleaning chemicals on EUV mask surfaces

    NASA Astrophysics Data System (ADS)

    Choi, Jaehyuck; Novak, Steve; Kandel, Yudhishthir; Denbeaux, Greg; Lee, Han-shin; Ma, Andy; Goodwin, Frank

    2012-03-01

    Photo-induced defects (or haze defects) on 193nm optic masks (haze defects) have been a serious problem not only to reticle engineers working for mask manufacturing and handling but also to photo-lithography engineers. The most widely accepted explanation of the root causes of haze defects is the cleaning chemical residues remaining on the mask surface and unavoidable outgassed molecules that outgas from pellicle materials when exposed to 193nm radiation. These have been significant challenges for reticle cleaning engineers who need to use cleaning chemicals whose residues do not lead to progressive defect formation on the mask and to find improved materials to minimize pellicle outgassing. It is assumed that contamination generation on EUV masks would have a higher probability than on optic masks, primarily since EUV masks are not protected by a pellicle and amorphous carbon films can accumulate during exposure to EUV light. While there is potential to mitigate the generation of carbon contamination by improving the exposure tool environment and removing carbon films using in-situ atomic hydrogen cleaning, it is not yet clear whether the reaction of mask cleaning chemicals to EUV radiation will lead to creation of progressive defects on EUV mask surfaces. With the work to being done it has been observed that carbon contamination on EUV masks dominates any effects of solvent chemicals under normal environmental or exposure conditions (from atmospheric pressure up to a vacuum level of 10-6 Torr) during EUV exposure. However, it is still unknown whether residual cleaning chemicals will provide a nucleus for progressive defect formation during exposure. This lack of understanding needs to be addressed by the industry as EUV masks are expected to undergo more frequent cleaning cycles. In this work, we will report on an investigation of the molecular behavior of cleaning chemicals on EUV mask surfaces during EUV exposure. Movement (e.g., migration or aggregation) of

  16. A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection

    SciTech Connect

    Huh, S.; Ren, L.; Chan, D.; Wurm, S.; Goldberg, K. A.; Mochi, I.; Nakajima, T.; Kishimoto, M.; Ahn, B.; Kang, I.; Park, J.-O.; Cho, K.; Han, S.-I.; Laursen, T.

    2010-03-12

    The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into high volume manufacturing. yet link data is available for understanding native defects on real masks. In this paper, a full-field EUV mask is fabricated to investigate the printability of various defects on the mask. The printability of defects and identification of their source from mask fabrication to handling were studied using wafer inspection. The printable blank defect density excluding particles and patterns is 0.63 cm{sup 2}. Mask inspection is shown to have better sensitivity than wafer inspection. The sensitivity of wafer inspection must be improved using through-focus analysis and a different wafer stack.

  17. Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations

    SciTech Connect

    Naulleau, Patrick; George, Simi

    2011-01-26

    In the case of extreme ultraviolet (EUV) lithography, modeling has shown that reflector phase roughness on the lithographic mask is a significant concern due to the image plan speckle it causes and the resulting line-edge roughness on imaged features. Modeling results have recently been used to determine the requirements for future production worthy masks yielding the extremely stringent specification of 50 pm rms roughness. Owing to the scale of the problem in terms of memory requirements, past modeling results have all been based on the thin mask approximation. EUV masks, however, are inherently three dimensional in nature and thus the question arises as to the validity of the thin mask approximation. Here we directly compare image plane speckle calculation results using the fast two dimensional thin mask model to rigorous finite-difference time-domain results and find the two methods to be comparable.

  18. Masking of aluminum surface against anodizing

    NASA Technical Reports Server (NTRS)

    Crawford, G. B.; Thompson, R. E.

    1969-01-01

    Masking material and a thickening agent preserve limited unanodized areas when aluminum surfaces are anodized with chromic acid. For protection of large areas it combines well with a certain self-adhesive plastic tape.

  19. Simplified models for mask roughness induced LER

    SciTech Connect

    McClinton, Brittany; Naulleau, Patrick

    2011-02-21

    The ITRS requires < 1.2nm line-edge roughness (LER) for the 22nm half-pitch node. Currently, we can consistently achieve only about 3nm LER. Further progress requires understanding the principle causes of LER. Much work has already been done on how both the resist and LER on the mask effect the final printed LER. What is poorly understood, however, is the extent to which system-level effects such as mask surface roughness, illumination conditions, and defocus couple to speckle at the image plane, and factor into LER limits. Presently, mask-roughness induced LER is studied via full 2D aerial image modeling and subsequent analysis of the resulting image. This method is time consuming and cumbersome. It is, therefore, the goal of this research to develop a useful 'rule-of-thumb' analytic model for mask roughness induced LER to expedite learning and understanding.

  20. Inspection of lithographic mask blanks for defects

    DOEpatents

    Sommargren, Gary E.

    2001-01-01

    A visible light method for detecting sub-100 nm size defects on mask blanks used for lithography. By using optical heterodyne techniques, detection of the scattered light can be significantly enhanced as compared to standard intensity detection methods. The invention is useful in the inspection of super-polished surfaces for isolated surface defects or particulate contamination and in the inspection of lithographic mask or reticle blanks for surface defects or bulk defects or for surface particulate contamination.

  1. Thorough characterization of a EUV mask

    SciTech Connect

    Mizuno, H.; McIntyre, G.; Koay, C.-W.; Burkhardt, M.; He, L.; Hartley, J.; Johnson, C.; Raghunathan, S.; Goldberg, K.; Mochi, I.; La Fontaine, B.; Wood, O.

    2009-06-25

    We reported that we were successful in our 45nm technology node device demonstration in February 2008 and 22nm node technology node device patterning in February 2009 using ASML's Alpha Demo Tool (ADT). In order to insert extreme ultraviolet (EUV) lithography at the 15nm technology node and beyond, we have thoroughly characterized one EUV mask, a so-called NOVACD mask. In this paper, we report on three topics, The first topic is an analysis of line edge roughness (LER) using a mask Scanning Electron Microscope (SEM), an Atomic Force Microscope (AFM) and the Actinic Inspection Tool (AIT) to compare resist images printed with the ASML ADT. The results of the analysis show a good correlation between the mask AFM and the mask SEM measurements, However, the resist printing results for the isolated space patterns are slightly different. The cause ofthis discrepancy may be resist blur, image log slope and SEM image quality and so on. The second topic is an analysis of mask topography using an AFM and relative reflectivity of mirror and absorber surface using the AIT, The AFM data show 6 and 7 angstrom rms roughness for mirror and absorber, respectively. The reflectivity measurements show that the mirror reflects EUV light about 20 times higher than absorber. The last topic is an analysis of a 32nm technology node SRAM cell which includes a comparison of mask SEM image, AIT image, resist image and simulation results. The ADT images of the SRAM pattern were of high quality even though the mask patters were not corrected for OPC or any EUV-specific effects. Image simulation results were in good agreement with the printing results.

  2. Helium superfluidity. Shapes and vorticities of superfluid helium nanodroplets.

    PubMed

    Gomez, Luis F; Ferguson, Ken R; Cryan, James P; Bacellar, Camila; Tanyag, Rico Mayro P; Jones, Curtis; Schorb, Sebastian; Anielski, Denis; Belkacem, Ali; Bernando, Charles; Boll, Rebecca; Bozek, John; Carron, Sebastian; Chen, Gang; Delmas, Tjark; Englert, Lars; Epp, Sascha W; Erk, Benjamin; Foucar, Lutz; Hartmann, Robert; Hexemer, Alexander; Huth, Martin; Kwok, Justin; Leone, Stephen R; Ma, Jonathan H S; Maia, Filipe R N C; Malmerberg, Erik; Marchesini, Stefano; Neumark, Daniel M; Poon, Billy; Prell, James; Rolles, Daniel; Rudek, Benedikt; Rudenko, Artem; Seifrid, Martin; Siefermann, Katrin R; Sturm, Felix P; Swiggers, Michele; Ullrich, Joachim; Weise, Fabian; Zwart, Petrus; Bostedt, Christoph; Gessner, Oliver; Vilesov, Andrey F

    2014-08-22

    Helium nanodroplets are considered ideal model systems to explore quantum hydrodynamics in self-contained, isolated superfluids. However, exploring the dynamic properties of individual droplets is experimentally challenging. In this work, we used single-shot femtosecond x-ray coherent diffractive imaging to investigate the rotation of single, isolated superfluid helium-4 droplets containing ~10(8) to 10(11) atoms. The formation of quantum vortex lattices inside the droplets is confirmed by observing characteristic Bragg patterns from xenon clusters trapped in the vortex cores. The vortex densities are up to five orders of magnitude larger than those observed in bulk liquid helium. The droplets exhibit large centrifugal deformations but retain axially symmetric shapes at angular velocities well beyond the stability range of viscous classical droplets. PMID:25146284

  3. VSP wave separation by adaptive masking filters

    NASA Astrophysics Data System (ADS)

    Rao, Ying; Wang, Yanghua

    2016-06-01

    In vertical seismic profiling (VSP) data processing, the first step might be to separate the down-going wavefield from the up-going wavefield. When using a masking filter for VSP wave separation, there are difficulties associated with two termination ends of the up-going waves. A critical challenge is how the masking filter can restore the energy tails, the edge effect associated with these terminations uniquely exist in VSP data. An effective strategy is to implement masking filters in both τ-p and f-k domain sequentially. Meanwhile it uses a median filter, producing a clean but smooth version of the down-going wavefield, used as a reference data set for designing the masking filter. The masking filter is implemented adaptively and iteratively, gradually restoring the energy tails cut-out by any surgical mute. While the τ-p and the f-k domain masking filters target different depth ranges of VSP, this combination strategy can accurately perform in wave separation from field VSP data.

  4. Mask cost of ownership for advanced lithography

    NASA Astrophysics Data System (ADS)

    Muzio, Edward G.; Seidel, Philip K.

    2000-07-01

    As technology advances, becoming more difficult and more expensive, the cost of ownership (CoO) metric becomes increasingly important in evaluating technical strategies. The International SEMATECH CoC analysis has steadily gained visibility over the past year, as it attempts to level the playing field between technology choices, and create a fair relative comparison. In order to predict mask cots for advanced lithography, mask process flows are modeled using bets-known processing strategies, equipment cost, and yields. Using a newly revised yield mode, and updated mask manufacture flows, representative mask flows can be built. These flows are then used to calculate mask costs for advanced lithography down to the 50 nm node. It is never the goal of this type of work to provide absolute cost estimates for business planning purposes. However, the combination of a quantifiable yield model with a clearly defined set of mask processing flows and a cost model based upon them serves as an excellent starting point for cost driver analysis and process flow discussion.

  5. COSMIC-RAY HELIUM HARDENING

    SciTech Connect

    Ohira, Yutaka; Ioka, Kunihito

    2011-03-01

    Recent observations by the CREAM and ATIC-2 experiments suggest that (1) the spectrum of cosmic-ray (CR) helium is harder than that of CR protons below the knee energy, 10{sup 15}eV, and (2) all CR spectra become hard at {approx}>10{sup 11}eV nucleon{sup -1}. We propose a new idea, that higher energy CRs are generated in a more helium-rich region, to explain the hardening without introducing different sources for CR helium. The helium-to-proton ratio at {approx}100 TeV exceeds the Big Bang abundance Y = 0.25 by several times, and the different spectrum is not reproduced within the diffusive shock acceleration theory. We argue that CRs are produced in a chemically enriched region, such as a superbubble, and the outward-decreasing abundance naturally leads to the hard spectrum of CR helium if CRs escape from the supernova remnant shock in an energy-dependent way. We provide a simple analytical spectrum that also fits well the hardening due to the decreasing Mach number in the hot superbubble with {approx}10{sup 6} K. Our model predicts hard and concave spectra for heavier CR elements.

  6. Method of fabricating optical waveguides by ion implantation doping

    DOEpatents

    Appleton, Bill R.; Ashley, Paul R.; Buchal, Christopher J.

    1989-01-01

    A method for fabricating high-quality optical waveguides in optical quality oxide crystals by ion implantation doping and controlled epitaxial recrystallization is provided. Masked LiNbO.sub.3 crystals are implanted with high concentrations of Ti dopant at ion energies of about 350 keV while maintaining the crystal near liquid nitrogen temperature. Ion implantation doping produces an amorphous, Ti-rich nonequilibrium phase in the implanted region. Subsequent thermal annealing in a water-saturated oxygen atmosphere at up to 1000.degree. C. produces solid-phase epitaxial regrowth onto the crystalline substrate. A high-quality single crystalline layer results which incorporates the Ti into the crystal structure at much higher concentrations than is possible by standard diffusion techniques, and this implanted region has excellent optical waveguides properties.

  7. Method of fabricating optical waveguides by ion implantation doping

    DOEpatents

    Appleton, B.R.; Ashley, P.R.; Buchal, C.J.

    1987-03-24

    A method for fabricating high-quality optical waveguides in optical quality oxide crystals by ion implantation doping and controlled epitaxial recrystallization is provided. Masked LiNbO/sub 3/ crystals are implanted with high concentrations of Ti dopant at ion energies of about 360 keV while maintaining the crystal near liquid nitrogen temperature. Ion implantation doping produces an amorphous, Ti-rich nonequilibrium phase in the implanted region. Subsequent thermal annealing in a water-saturated oxygen atmosphere at up to 1000/degree/C produces solid-phase epitaxial regrowth onto the crystalline substrate. A high-quality crystalline layer results which incorporates the Ti into the crystal structure at much higher concentrations than is possible by standard diffusion techniques, and this implanted region has excellent optical waveguiding properties.

  8. 21 CFR 868.5560 - Gas mask head strap.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Gas mask head strap. 868.5560 Section 868.5560...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5560 Gas mask head strap. (a) Identification. A gas mask head strap is a device used to hold an anesthetic gas mask in position on a...

  9. 42 CFR 84.111 - Gas masks; required components.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ....111 Gas masks; required components. (a) Each gas mask described in § 84.110 shall, where its design... each gas mask shall meet the minimum construction requirements set forth in subpart G of this part. ... 42 Public Health 1 2011-10-01 2011-10-01 false Gas masks; required components. 84.111 Section...

  10. 37 CFR 211.3 - Mask work fees.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2012-07-01 2012-07-01 false Mask work fees. 211.3 Section... PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask works. (b)...

  11. 37 CFR 211.3 - Mask work fees.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2013-07-01 2013-07-01 false Mask work fees. 211.3 Section... PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask works. (b)...

  12. 37 CFR 211.3 - Mask work fees.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2011-07-01 2011-07-01 false Mask work fees. 211.3 Section... PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask works. (b)...

  13. 37 CFR 211.3 - Mask work fees.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2010-07-01 2010-07-01 false Mask work fees. 211.3 Section... PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask works. (b)...

  14. 37 CFR 211.3 - Mask work fees.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2014-07-01 2014-07-01 false Mask work fees. 211.3 Section... AND PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask...

  15. Ceramic Masks--A Multi-Cultural Experience

    ERIC Educational Resources Information Center

    Penn, Elizabeth E.

    1978-01-01

    The creation of ceramic masks in reaction to the film, Roots, focused on the functions of the masks themselves within a particular society, the materials and techniques used to create these masks, and the identification of typical shapes of heads and facial features on the masks in each culture. (Author/RK)

  16. 42 CFR 84.111 - Gas masks; required components.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 42 Public Health 1 2013-10-01 2013-10-01 false Gas masks; required components. 84.111 Section 84... AND HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.111 Gas masks; required components. (a) Each gas mask described in § 84.110 shall, where its...

  17. 42 CFR 84.111 - Gas masks; required components.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 42 Public Health 1 2012-10-01 2012-10-01 false Gas masks; required components. 84.111 Section 84... AND HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.111 Gas masks; required components. (a) Each gas mask described in § 84.110 shall, where its...

  18. Helium and neon in lunar ilmenites of different antiquities

    NASA Technical Reports Server (NTRS)

    Nier, A. O.; Schlutter, D. J.

    1994-01-01

    Helium and neon were extracted from individual lunar ilmenite grains, approximately 100 micrometers in diameter, using a pulsed step-heating technique. Grains from lunar samples 71501 and 79035, believed to have been exposed to solar corpuscular radiation at greatly different times, were studied. The results found were consistent with the hypothesis that in addition to solar-wind-implanted gas, a second more deeply implanted component was present in both species of grains. Average isotopic ratios were determined giving equal weight to each of the particles. As found in depth studies employing chemical etching, both the He-3/He-4 and Ne-20/Ne-22 ratios were lower in the more deeply implanted gas than in the solar wind component. The He-3/He-4 ratio in the solar wind component of the more ancient grains was lower than that in the more recently exposed ones, whereas no difference was found for the more deeply embedded He. In the deeply embedded component of the ancient grains, the He-4/Ne-20 ratio was approx. 2x that found in the more recently exposed grains. In the shallowly implanted component, the ratio varied greatly from grain to grain, preventing comparison with the solar wind elemental composition.

  19. Wide-band six-region phase mask coronagraph.

    PubMed

    Hou, Fanzhen; Cao, Qing; Zhu, Minning; Ma, Ourui

    2014-01-27

    An achromatic six-region phase mask coronagraph, used for the detection of exoplanets, is proposed. The mask has six regions in angular direction and could work in wideband. Furthermore, a six-level phase mask, as an example of the six-region phase mask, is theoretically investigated. According to numerical simulations, this specific mask has a deep elimination of starlight, good performance of achromatism and small inner working angle. As a single phase mask, the ratio of the remaining starlight of the six-level phase mask to the total incident starlight is less than 0.001 when the wavelength is between 500 nm and 600 nm. PMID:24515197

  20. Rogue mantle helium and neon.

    PubMed

    Albarède, Francis

    2008-02-15

    The canonical model of helium isotope geochemistry describes the lower mantle as undegassed, but this view conflicts with evidence of recycled material in the source of ocean island basalts. Because mantle helium is efficiently extracted by magmatic activity, it cannot remain in fertile mantle rocks for long periods of time. Here, I suggest that helium with high 3He/4He ratios, as well as neon rich in the solar component, diffused early in Earth's history from low-melting-point primordial material into residual refractory "reservoir" rocks, such as dunites. The difference in 3He/4He ratios of ocean-island and mid-ocean ridge basalts and the preservation of solar neon are ascribed to the reservoir rocks being stretched and tapped to different extents during melting. PMID:18202257

  1. DIADDHEM set-up: New IBA facility for studying the helium behavior in nuclear glasses

    NASA Astrophysics Data System (ADS)

    Chamssedine, F.; Sauvage, T.; Peuget, S.

    2010-06-01

    The immobilization of fission products and minor actinides by vitrification is the reference process for industrial management of high-level radioactive wastes generated from spent fuel reprocessing. The glassy matrix is subjected to radiation damage and radiogenic helium generation due to the alpha decays of minor actinides. A specific experimental study has been conducted to better understand the behavior of helium and its diffusion mechanisms in the borosilicate glass. Helium production is simulated by external irradiation with 3He + ions at a concentration (2 × 10 15 He cm -2) equivalent to the one obtained after 1000 years of glass storage. He diffusion coefficients as function of temperature are extracted from the evolution of the depth profiles after annealing. The 3He(d, α) 1H Nuclear Reaction Analysis (NRA) technique is successfully used for in situ low-temperature measurements of depth profiles. Its high depth resolution allows detecting helium mobility at a temperature as low as 250 K and the presence of a trapped helium fraction. The good agreement of our first values of diffusion coefficients with the literature data highlights the relevance of the implantation technique in the study of helium diffusion mechanisms in borosilicate glasses.

  2. Helium abundances on the moon: Assumptions and estimates

    NASA Technical Reports Server (NTRS)

    Taylor, Lawrence A.

    1991-01-01

    Nuclear energy is a highly desirable source of energy, and He-3 is the most prized of the fusion reactants. As the Wisconsin Group has emphasized, He-3 may be the only true economic ore on the Moon. The lack of a shielding atmosphere on the Moon permits solar-wind alpha particles to impinge upon the lunar regolith and become implanted into the various solid components. In particular, large quantities of helium (5 to 50 ppm) are presented. The measured parameter of I(sub s)/FeO, a direct indicator of maturity and exposure age, can be used as a first approximation to predict the abundances of many solar-wind components in the soils. However, because ilmenite has a much higher retentivity for helium than the other phases, the TiO2 contents of the soils are better indicators of helium contents (Taylor, Space 90). High-Ti mare bassalt regions, such as at the Apollo 17 locale, appear to be the best areas for He mining (15 to 50 ppm He(sub T)), versus 3 to 9 ppm in the Highlands. However, the relationships between I(sub s)/FeO, TiO2 and He-3 contents are complicated - e.g., many of the most He-rich soils are immature to submature. The amount of He-3 in the regolith of the moon is estimated at 220,000 tons in the outer 2 m of the Maria.

  3. Pulsed helium ionization detection system

    DOEpatents

    Ramsey, Roswitha S.; Todd, Richard A.

    1987-01-01

    A helium ionization detection system is provided which produces stable operation of a conventional helium ionization detector while providing improved sensitivity and linearity. Stability is improved by applying pulsed dc supply voltage across the ionization detector, thereby modifying the sampling of the detectors output current. A unique pulse generator is used to supply pulsed dc to the detector which has variable width and interval adjust features that allows up to 500 V to be applied in pulse widths ranging from about 150 nsec to about dc conditions.

  4. Pulsed helium ionization detection system

    DOEpatents

    Ramsey, R.S.; Todd, R.A.

    1985-04-09

    A helium ionization detection system is provided which produces stable operation of a conventional helium ionization detector while providing improved sensitivity and linearity. Stability is improved by applying pulsed dc supply voltage across the ionization detector, thereby modifying the sampling of the detectors output current. A unique pulse generator is used to supply pulsed dc to the detector which has variable width and interval adjust features that allows up to 500 V to be applied in pulse widths ranging from about 150 nsec to about dc conditions.

  5. Temporal processes in prime–mask interaction: Assessing perceptual consequences of masked information

    PubMed Central

    Scharlau, Ingrid

    2008-01-01

    Visual backward masking is frequently used to study the temporal dynamics of visual perception. These dynamics may include the temporal features of conscious percepts, as suggested, for instance, by the asynchronous–updating model (Neumann, 1982) and perceptual–retouch theory ((Bachmann, 1994). These models predict that the perceptual latency of a visual backward mask is shorter than that of a like reference stimulus that was not preceded by a masked stimulus. The prediction has been confirmed by studies using temporal–order judgments: For certain asynchronies between mask and reference stimulus, temporal–order reversals are quite frequent (e.g. Scharlau, & Neumann, 2003a). However, it may be argued that these reversals were due to a response bias in favour of the mask rather than true temporal-perceptual effects. I introduce two measures for assessing latency effects that (1) are not prone to such a response bias, (2) allow to quantify the latency gain, and (3) extend the perceptual evidence from order reversals to duration/interval perception, that is, demonstrate that the perceived interval between a mask and a reference stimulus may be shortened as well as prolonged by the presence of a masked stimulus. Consequences for theories of visual masking such as asynchronous–updating, perceptual–retouch, and reentrant models are discussed. PMID:20517512

  6. ASTER nighttime cloud mask database using MODIS cloud mask (MOD35) products

    NASA Astrophysics Data System (ADS)

    Tonooka, Hideyuki

    2008-10-01

    Cloud assessment for ASTER nighttime scenes is not accurate because the ASTER Cloud Coverage Assessment Algorithm (ACCAA) thresholds with only one thermal infrared (TIR) band for nighttime scenes. First in the present paper, it is shown that the original ACCAA cloud masks differ considerably from the masks interpolated from MODIS Cloud Mask Products (MOD35), and this discrepancy is caused from errors in the ACCAA masks by visual check for 543 scenes. In addition, uncertain pixels included in MOD35 masks, which are classified to neither cloud nor clear, are visually checked for 76 scenes. Then, the ASTER nighttime cloud mask database using MOD35 products is introduced. It provides the interpolated MOD35 cloud masks for almost all ASTER nighttime scenes (143,242 scenes as of July 2008) through Internet. The database also shows that clear scenes with cloud coverage of 20% or less are about 34% of the total nighttime scenes. In the final part of the paper, an algorithm for reclassifying an interpolated MOD35 mask using ASTER measurements is proposed and applied to 42 test scenes. The algorithm will work well for some scenes, but less well for snow/ice surfaces, and thin, cirrus, and high clouds, due to the band limitation of ASTER/TIR. If a spatial uniformity test is added, the algorithm performance may be improved.

  7. The Intervenor Effect in Masked Priming: How Does Masked Priming Survive across an Intervening Word?

    ERIC Educational Resources Information Center

    Forster, Kenneth I.

    2009-01-01

    Four masked priming experiments are reported investigating the effect of inserting an unrelated word between the masked prime and the target. When the intervening word is visible, identity priming is reduced to the level of one-letter-different form priming, but form priming is largely unaffected. However, when the intervening word is itself…

  8. Impact of mask line edge roughness and statistical noise on next generation mask making

    NASA Astrophysics Data System (ADS)

    Kim, Byung Gook; Choi, Jin; Lee, Sang Hee; Jeon, Chan Uk

    2012-06-01

    As extreme ultraviolet lithography (EUVL) moves toward high volume manufacturing and pushes to increasingly smaller critical dimensions, achieving the stringent requirements for line edge roughness (LER) is increasingly challenging. For the 22 nm half-pitch node and beyond, the International Roadmap for Semiconductors requires less than 1.6 nm of line width roughness (LWR) on the wafer. The major contributor of this tight LWR is wafer resist LER and mask LER. However, in current ITRS, there is no guideline for mask LER. While significant progress has been made to reduce the resist of the LER on the wafer, it is not yet clear how much the mask LER should be improved for a 22 nm half-pitch node application. Additionally, there are various approaches to obtaining a smaller LER on the mask. It could be improved either by reducing well-known statistical noise or manipulating some process condition or material. Both approaches are effective in improving the LER, however, they shows a different result in mask CD uniformity itself. In this paper, in addition to setting the criteria of the mask LER, we will discuss how tight the mask LER is required to be and what kind of approach is desirable with regards to the LER and CD uniformity. Finally, an analysis of the LER and CD variation provides some insights into the impact of the next generation mask infrastructure.

  9. Mask automation: need a revolution in mask makers and equipment industry

    NASA Astrophysics Data System (ADS)

    Moon, Seong-yong; Yu, Sang-yong; Noh, Young-hwa; Son, Ki-jung; Lee, Hyun-Joo; Cho, Han-Ku

    2013-09-01

    As improving device integration for the next generation, high performance and cost down are also required accordingly in semiconductor business. Recently, significant efforts have been given on putting EUV technology into fabrication in order to improve device integration. At the same time, 450mm wafer manufacturing environment has been considered seriously in many ways in order to boost up the productivity. Accordingly, 9-inch mask has been discussed in mask fabrication business recently to support 450mm wafer manufacturing environment successfully. Although introducing 9-inch mask can be crucial for mask industry, multi-beam technology is also expected as another influential turning point to overcome currently the most critical issue in mask industry, electron beam writing time. No matter whether 9-inch mask or multi-beam technology will be employed or not, mask quality and productivity will be the key factors to survive from the device competition. In this paper, the level of facility automation in mask industry is diagnosed and analyzed and the automation guideline is suggested for the next generation.

  10. 43 CFR 3100.1 - Helium.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 43 Public Lands: Interior 2 2011-10-01 2011-10-01 false Helium. 3100.1 Section 3100.1 Public Lands: Interior Regulations Relating to Public Lands (Continued) BUREAU OF LAND MANAGEMENT, DEPARTMENT OF THE... Helium. The ownership of and the right to extract helium from all gas produced from lands leased...

  11. 43 CFR 3100.1 - Helium.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 43 Public Lands: Interior 2 2014-10-01 2014-10-01 false Helium. 3100.1 Section 3100.1 Public Lands: Interior Regulations Relating to Public Lands (Continued) BUREAU OF LAND MANAGEMENT, DEPARTMENT OF THE... Helium. The ownership of and the right to extract helium from all gas produced from lands leased...

  12. 30 CFR 256.11 - Helium.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... 30 Mineral Resources 2 2011-07-01 2011-07-01 false Helium. 256.11 Section 256.11 Mineral Resources... Sulphur Management, General § 256.11 Helium. (a) Each lease issued or continued under these regulations... of and the right to extract helium from all gas produced from the leased area. (b) In case the...

  13. 21 CFR 184.1355 - Helium.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 3 2010-04-01 2009-04-01 true Helium. 184.1355 Section 184.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) FOOD FOR HUMAN... Substances Affirmed as GRAS § 184.1355 Helium. (a) Helium (empirical formula He, CAS Reg. No. 7440-59-7) is...

  14. 21 CFR 582.1355 - Helium.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 6 2010-04-01 2010-04-01 false Helium. 582.1355 Section 582.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) ANIMAL DRUGS, FEEDS... Helium. (a) Product. Helium. (b) Conditions of use. This substance is generally recognized as safe...

  15. 21 CFR 582.1355 - Helium.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 6 2011-04-01 2011-04-01 false Helium. 582.1355 Section 582.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) ANIMAL DRUGS, FEEDS... Helium. (a) Product. Helium. (b) Conditions of use. This substance is generally recognized as safe...

  16. 43 CFR 3100.1 - Helium.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 43 Public Lands: Interior 2 2012-10-01 2012-10-01 false Helium. 3100.1 Section 3100.1 Public Lands: Interior Regulations Relating to Public Lands (Continued) BUREAU OF LAND MANAGEMENT, DEPARTMENT OF THE... Helium. The ownership of and the right to extract helium from all gas produced from lands leased...

  17. 30 CFR 556.11 - Helium.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... 30 Mineral Resources 2 2013-07-01 2013-07-01 false Helium. 556.11 Section 556.11 Mineral Resources... § 556.11 Helium. (a) Each lease issued or continued under these regulations shall be subject to a... helium from all gas produced from the leased area. (b) In case the United States elects to take...

  18. 21 CFR 582.1355 - Helium.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 6 2013-04-01 2013-04-01 false Helium. 582.1355 Section 582.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) ANIMAL DRUGS, FEEDS... Helium. (a) Product. Helium. (b) Conditions of use. This substance is generally recognized as safe...

  19. 30 CFR 556.11 - Helium.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... 30 Mineral Resources 2 2014-07-01 2014-07-01 false Helium. 556.11 Section 556.11 Mineral Resources... § 556.11 Helium. (a) Each lease issued or continued under these regulations shall be subject to a... helium from all gas produced from the leased area. (b) In case the United States elects to take...

  20. 30 CFR 556.11 - Helium.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... 30 Mineral Resources 2 2012-07-01 2012-07-01 false Helium. 556.11 Section 556.11 Mineral Resources... § 556.11 Helium. (a) Each lease issued or continued under these regulations shall be subject to a... helium from all gas produced from the leased area. (b) In case the United States elects to take...

  1. 43 CFR 3100.1 - Helium.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 43 Public Lands: Interior 2 2013-10-01 2013-10-01 false Helium. 3100.1 Section 3100.1 Public Lands: Interior Regulations Relating to Public Lands (Continued) BUREAU OF LAND MANAGEMENT, DEPARTMENT OF THE... Helium. The ownership of and the right to extract helium from all gas produced from lands leased...

  2. 21 CFR 184.1355 - Helium.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 3 2014-04-01 2014-04-01 false Helium. 184.1355 Section 184.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) DIRECT FOOD....1355 Helium. (a) Helium (empirical formula He, CAS Reg. No. 7440-59-7) is a colorless,...

  3. 21 CFR 582.1355 - Helium.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 6 2014-04-01 2014-04-01 false Helium. 582.1355 Section 582.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) ANIMAL DRUGS, FEEDS... Helium. (a) Product. Helium. (b) Conditions of use. This substance is generally recognized as safe...

  4. 21 CFR 184.1355 - Helium.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 3 2013-04-01 2013-04-01 false Helium. 184.1355 Section 184.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) FOOD FOR HUMAN... Substances Affirmed as GRAS § 184.1355 Helium. (a) Helium (empirical formula He, CAS Reg. No. 7440-59-7) is...

  5. 21 CFR 184.1355 - Helium.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 3 2012-04-01 2012-04-01 false Helium. 184.1355 Section 184.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) FOOD FOR HUMAN... Substances Affirmed as GRAS § 184.1355 Helium. (a) Helium (empirical formula He, CAS Reg. No. 7440-59-7) is...

  6. 21 CFR 184.1355 - Helium.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 3 2011-04-01 2011-04-01 false Helium. 184.1355 Section 184.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) FOOD FOR HUMAN... Substances Affirmed as GRAS § 184.1355 Helium. (a) Helium (empirical formula He, CAS Reg. No. 7440-59-7) is...

  7. 21 CFR 582.1355 - Helium.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 6 2012-04-01 2012-04-01 false Helium. 582.1355 Section 582.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) ANIMAL DRUGS, FEEDS... Helium. (a) Product. Helium. (b) Conditions of use. This substance is generally recognized as safe...

  8. Multipurpose top for liquid helium Dewar

    NASA Technical Reports Server (NTRS)

    Murphy, R. S.; Anderholm, J. R.

    1972-01-01

    Multipurpose top was fabricated for liquid helium Dewar flask which guards against flash vaporization of liquid helium and allows boiling temperature of liquid helium to be lowered by reduction of ambient pressure in Dewar flask. Device is rugged and simple, and does not require frequent calibrations or adjustments.

  9. Applying the helium ionization detector in chromatography

    NASA Technical Reports Server (NTRS)

    Gibson, E. K.; Andrawes, F. F.; Brazell, R. S.

    1981-01-01

    High noise levels and oversensitivity of helium detector make flame-ionization and thermal-conductivity detectors more suitable for chromotography. Deficiencies are eliminated by modifying helium device to operate in saturation rather than multiplication mode. Result is low background current, low noise, high stability, and high sensitivity. Detector analyzes halocarbons, hydrocarbons, hydrogen cyanide, ammonia, and inorganics without requiring expensive research-grade helium.

  10. AIMS mask qualification for 32nm node

    NASA Astrophysics Data System (ADS)

    Richter, Rigo; Thaler, Thomas; Seitz, Holger; Stroessner, Ulrich; Scheruebl, Thomas

    2009-10-01

    Moving forward to 32nm node and below optical lithography using 193nm is faced with complex requirements to be solved. Mask makers are forced to address both Double Patterning Techniques and Computational Lithography approaches such as Source Mask Optimizations and Inverse Lithography. Additionally, lithography at low k1 values increases the challenges for mask repair as well as for repair verification and review by AIMSTM. Higher CD repeatability, more flexibility in the illumination settings as well as significantly improved image performance must be added when developing the next generation mask qualification equipment. This paper reports latest measurement results verifying the appropriateness of the latest member of AIMSTM measurement tools - the AIMSTM 32-193i. We analyze CD repeatability measurements on lines and spaces pattern. The influence of the improved optical performance and newly introduced interferometer stage will be verified. This paper highlights both the new Double Patterning functionality emulating double patterning processes and the influence of its critical parameters such as overlay errors and resist impact. Beneficial advanced illumination schemes emulating scanner illumination document the AIMSTM 32-193i to meet mask maker community's requirements for the 32nm node.

  11. EUV mask process specifics and development challenges

    NASA Astrophysics Data System (ADS)

    Nesladek, Pavel

    2014-07-01

    EUV lithography is currently the favorite and most promising candidate among the next generation lithography (NGL) technologies. Decade ago the NGL was supposed to be used for 45 nm technology node. Due to introduction of immersion 193nm lithography, double/triple patterning and further techniques, the 193 nm lithography capabilities was greatly improved, so it is expected to be used successfully depending on business decision of the end user down to 10 nm logic. Subsequent technology node will require EUV or DSA alternative technology. Manufacturing and especially process development for EUV technology requires significant number of unique processes, in several cases performed at dedicated tools. Currently several of these tools as e.g. EUV AIMS or actinic reflectometer are not available on site yet. The process development is done using external services /tools with impact on the single unit process development timeline and the uncertainty of the process performance estimation, therefore compromises in process development, caused by assumption about similarities between optical and EUV mask made in experiment planning and omitting of tests are further reasons for challenges to unit process development. Increased defect risk and uncertainty in process qualification are just two examples, which can impact mask quality / process development. The aim of this paper is to identify critical aspects of the EUV mask manufacturing with respect to defects on the mask with focus on mask cleaning and defect repair and discuss the impact of the EUV specific requirements on the experiments needed.

  12. Mask and lithography techniques for FPD

    NASA Astrophysics Data System (ADS)

    Sandstrom, T.; Wahlsten, M.; Sundelin, E.; Hansson, G.; Svensson, A.

    2015-09-01

    Large-field projection lithography for FPDs has developed gradually since the 90s. The LCD screen technology has remained largely unchanged and incremental development has given us better image quality, larger screen sizes, and above all lower cost per area. Recently new types of mobile devices with very high pixel density and/or OLED displays have given rise to dramatically higher requirem ents on photomask technology. Devices with 600 ppi or m ore need lithography with higher optical resolution and better linewidth control. OLED di splays pose new challenges with high sensitivity to transistor parameters and to capacitive cross-talk. New mask requirements leads to new maskwriter requirements and Mycronic has developed a new generation of large -area mask writers with significantly improved properties. This paper discusses and shows data for the improved writers. Mask production to high er quality stan dards also need metrology to verify the quality and Mycronic has introduced a 2D metrology tool with accuracy adequate for current and future masks. New printing or additive methods of producing disp lays on plastic or metal foil will make low-cost disp lays available. This inexpensive type of disp lays will exist side by side with the photographic quality displays of TVs and mobile devices, which will continue to be a challenge in terms of mask and production quality.

  13. Calculating aerial images from EUV masks

    NASA Astrophysics Data System (ADS)

    Pistor, Thomas V.; Neureuther, Andrew R.

    1999-06-01

    Aerial images for line/space patterns, arrays of posts and an arbitrary layout pattern are calculated for EUV masks in a 4X EUV imaging system. Both mask parameters and illumination parameters are varied to investigate their effects on the aerial image. To facilitate this study, a parallel version of TEMPEST with a Fourier transform boundary condition was developed and run on a network of 24 microprocessors. Line width variations are observed when absorber thickness or sidewall angle changes. As the line/space pattern scales to smaller dimensions, the aspect ratios of the absorber features increase, introducing geometric shadowing and reducing aerial image intensity and contrast. 100nm square posts have circular images of diameter close to 100nm, but decreasing in diameter significantly when the corner round radius at the mask becomes greater than 50 nm. Exterior mask posts image slightly smaller and with higher ellipticity than interior mask posts. The aerial image of the arbitrary test pattern gives insight into the effects of the off-axis incidence employed in EUV lithography systems.

  14. Why Helium Ends in "-Ium"

    ERIC Educational Resources Information Center

    Jensen, William B.; Holme, Thomas; Cooper, Melanie; White, Carol

    2004-01-01

    Edward Frankland and Norman Lockyer researched upon a gaseous spectra in relation to the physical constitution of the sun and named it as "helium" (from Greek "helios" meaning "sun"). Since Lockyer apparently never formally proposed the name in print, it is not known why he chose to use a metallic end "ium".

  15. Helium diffusion in the sun

    NASA Technical Reports Server (NTRS)

    Bahcall, J. N.; Pinsonneault, M. H.

    1992-01-01

    We calculate improved standard solar models using the new Livermore (OPAL) opacity tables, an accurate (exportable) nuclear energy generation routine which takes account of recent measurements and analyses, and the recent Anders-Grevesse determination of heavy element abundances. We also evaluate directly the effect of the diffusion of helium with respect to hydrogen on the calculated neutrino fluxes, on the primordial solar helium abundance, and on the depth of the convective zone. Helium diffusion increases the predicted event rates by about 0.8 SNU, or 11 percent of the total rate, in the chlorine solar neutrino experiment, by about 3.5 SNU, or 3 percent, in the gallium solar neutrino experiments, and by about 12 percent in the Kamiokande and SNO solar neutrino experiments. The best standard solar model including helium diffusion and the most accurate nuclear parameters, element abundances, and radiative opacity predicts a value of 8.0 SNU +/- 3.0 SNU for the C1-37 experiment and 132 +21/-17 SNU for the Ga - 71 experiment, where the uncertainties include 3 sigma errors for all measured input parameters.

  16. Counteracting Power Analysis Attacks by Masking

    NASA Astrophysics Data System (ADS)

    Oswald, Elisabeth; Mangard, Stefan

    The publication of power analysis attacks [12] has triggered a lot of research activities. On the one hand these activities have been dedicated toward the development of secure and efficient countermeasures. On the other hand also new and improved attacks have been developed. In fact, there has been a continuous arms race between designers of countermeasures and attackers. This chapter provides a brief overview of the state-of-the art in the arms race in the context of a countermeasure called masking. Masking is a popular countermeasure that has been extensively discussed in the scientific community. Numerous articles have been published that explain different types of masking and that analyze weaknesses of this countermeasure.

  17. Advanced mask aligner lithography: new illumination system.

    PubMed

    Voelkel, Reinhard; Vogler, Uwe; Bich, Andreas; Pernet, Pascal; Weible, Kenneth J; Hornung, Michael; Zoberbier, Ralph; Cullmann, Elmar; Stuerzebecher, Lorenz; Harzendorf, Torsten; Zeitner, Uwe D

    2010-09-27

    A new illumination system for mask aligner lithography is presented. The illumination system uses two subsequent microlens-based Köhler integrators. The second Köhler integrator is located in the Fourier plane of the first. The new illumination system uncouples the illumination light from the light source and provides excellent uniformity of the light irradiance and the angular spectrum. Spatial filtering allows to freely shape the angular spectrum to minimize diffraction effects in contact and proximity lithography. Telecentric illumination and ability to precisely control the illumination light allows to introduce resolution enhancement technologies (RET) like customized illumination, optical proximity correction (OPC) and source-mask optimization (SMO) in mask aligner lithography. PMID:20940992

  18. Hydrogen, helium, and other solar-wind components in lunar soil - Abundances and predictions

    NASA Technical Reports Server (NTRS)

    Taylor, Lawrence A.

    1990-01-01

    The lack of a shielding atmosphere on the moon permits solar-wind particles to impinge upon the lunar soil and become implanted into the various phases which comprise the soil. Relatively large quantities of solar-wind implanted hydrogen (50-100 ppm) and helium (10-50 ppm) are present. The measured parameter of I(s)FeO, a direct indicator of maturity and exposure age, can be used as a first approximation to predict the abundances of many solar-wind components in the soils. However, because ilmenite acts as a 'sponge' for the retention of certain elements, the TiO2 content of the soil is a better indicator for hydrogen and helium contents.

  19. Imaging of tritium implanted into graphite

    SciTech Connect

    Malinowski, M.E.; Causey, R.A.

    1988-05-01

    The extensive use of graphite in plasma-facing surfaces of tokamaks such as the Tokamak Fusion Test Reactor, which has planned tritium discharges, makes two-dimensional tritium detection techniques important in helping to determine torus tritium inventories. We have performed experiments in which highly oriented pyrolytic graphite (HOPG) samples were first tritium implanted with fluences of approx.10/sup 16/ T/cm/sup 2/ at energies approx. <25 eV and then the near-surface implant distributions were detected in two dimensions using tritium imaging. A portion of the sample was masked off during the implant in order to produce a well-defined implant boundary. Heating of the HOPG samples to temperatures as high as 500 /sup 0/C resulted in no discernible motion of tritium along the basal plane, but did show that significant desorption of the implanted tritium occurred. The current results indicate that tritium in quantities of 10/sup 12/ T/cm/sup 2/ in tritiated components could be readily detected by imaging at lower magnifications.

  20. An ERP indicator of processing relevant gestalts in masked priming.

    PubMed

    Verleger, Rolf; Görgen, Stefani; Jaśkowski, Piotr

    2005-11-01

    Briefly presented arrows, made indistinguishable by masks that contain arrows, inversely prime responses to following visible arrows. This inverse effect might reflect general regularities of masked priming or be either due to the task-relevant elements of the mask or to special features of arrows. Here we report a slow negative EEG potential recorded from the scalp above the visual cortex, which is evoked by masks that contain arrows. Even being evoked when arrows masks were presented in isolation, this "Nd-mask" appeared to be an obligatory response. Yet Nd-mask was enhanced when primes and targets were arrows and was reduced in the other cases, and even reversed its polarity with appropriate control stimuli. These findings provide support both for the special status of arrows and for the notion of mask relevance. Nd-mask might be one instance of negative EEG potentials evoked by stimuli with familiar gestalts. PMID:16364063

  1. Communication masking in marine mammals: A review and research strategy.

    PubMed

    Erbe, Christine; Reichmuth, Colleen; Cunningham, Kane; Lucke, Klaus; Dooling, Robert

    2016-02-15

    Underwater noise, whether of natural or anthropogenic origin, has the ability to interfere with the way in which marine mammals receive acoustic signals (i.e., for communication, social interaction, foraging, navigation, etc.). This phenomenon, termed auditory masking, has been well studied in humans and terrestrial vertebrates (in particular birds), but less so in marine mammals. Anthropogenic underwater noise seems to be increasing in parts of the world's oceans and concerns about associated bioacoustic effects, including masking, are growing. In this article, we review our understanding of masking in marine mammals, summarise data on marine mammal hearing as they relate to masking (including audiograms, critical ratios, critical bandwidths, and auditory integration times), discuss masking release processes of receivers (including comodulation masking release and spatial release from masking) and anti-masking strategies of signalers (e.g. Lombard effect), and set a research framework for improved assessment of potential masking in marine mammals. PMID:26707982

  2. Abnormalities of physics and mechanical properties, behavior of helium and hydrogen in the V-Ti alloys (Overview)

    NASA Astrophysics Data System (ADS)

    Staltsov, M. S.; Chernov, I. I.; Kalin, B. A.; Korchagin, O. N.; Anan'in, V. M.

    2016-04-01

    The paper presents the results of studies of physical and mechanical properties, helium and hydrogen behavior in vanadium-titanium alloys depending on titanium content. In particular, the results of helium swelling research, thermal desorption studies of helium and hydrogen behavior, results of internal friction measurements, measuring amount of hydrogen retained introduced by various methods. It was shown that the addition of titanium to vanadium have nonmonotonic influence on the behavior of implanted helium and hydrogen, as well as on the physical and mechanical and radiation properties known in literature. It is expected that such an abnormal influence of titanium on various properties of vanadium-titanium alloys occurs because of the interaction of vanadium and titanium atoms with atoms of interstitial impurities.

  3. Masked fake face detection using radiance measurements.

    PubMed

    Kim, Youngshin; Na, Jaekeun; Yoon, Seongbeak; Yi, Juneho

    2009-04-01

    This research presents a novel 2D feature space where real faces and masked fake faces can be effectively discriminated. We exploit the reflectance disparity based on albedo between real faces and fake materials. The feature vector used consists of radiance measurements of the forehead region under 850 and 685 nm illuminations. Facial skin and mask material show linearly separable distributions in the feature space proposed. By simply applying Fisher's linear discriminant, we have achieved 97.78% accuracy in fake face detection. Our method can be easily implemented in commercial face verification systems. PMID:19340250

  4. Robust speech recognition from binary masks.

    PubMed

    Narayanan, Arun; Wang, DeLiang

    2010-11-01

    Inspired by recent evidence that a binary pattern may provide sufficient information for human speech recognition, this letter proposes a fundamentally different approach to robust automatic speech recognition. Specifically, recognition is performed by classifying binary masks corresponding to a word utterance. The proposed method is evaluated using a subset of the TIDigits corpus to perform isolated digit recognition. Despite dramatic reduction of speech information encoded in a binary mask, the proposed system performs surprisingly well. The system is compared with a traditional HMM based approach and is shown to perform well under low SNR conditions. PMID:21110529

  5. Free electron laser with masked chicane

    DOEpatents

    Nguyen, Dinh C.; Carlsten, Bruce E.

    1999-01-01

    A free electron laser (FEL) is provided with an accelerator for outputting electron beam pulses; a buncher for modulating each one of the electron beam pulses to form each pulse into longitudinally dispersed bunches of electrons; and a wiggler for generating coherent light from the longitudinally dispersed bunches of electrons. The electron beam buncher is a chicane having a mask for physically modulating the electron beam pulses to form a series of electron beam bunches for input to the wiggler. In a preferred embodiment, the mask is located in the chicane at a position where each electron beam pulse has a maximum dispersion.

  6. Carbon contamination topography analysis of EUV masks

    SciTech Connect

    Fan, Y.-J.; Yankulin, L.; Thomas, P.; Mbanaso, C.; Antohe, A.; Garg, R.; Wang, Y.; Murray, T.; Wuest, A.; Goodwin, F.; Huh, S.; Cordes, A.; Naulleau, P.; Goldberg, K. A.; Mochi, I.; Gullikson, E.; Denbeaux, G.

    2010-03-12

    The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data.

  7. Understanding speech in modulated interference: Cochlear implant users and normal-hearing listeners

    NASA Astrophysics Data System (ADS)

    Nelson, Peggy B.; Jin, Su-Hyun; Carney, Arlene Earley; Nelson, David A.

    2003-02-01

    Many competing noises in real environments are modulated or fluctuating in level. Listeners with normal hearing are able to take advantage of temporal gaps in fluctuating maskers. Listeners with sensorineural hearing loss show less benefit from modulated maskers. Cochlear implant users may be more adversely affected by modulated maskers because of their limited spectral resolution and by their reliance on envelope-based signal-processing strategies of implant processors. The current study evaluated cochlear implant users' ability to understand sentences in the presence of modulated speech-shaped noise. Normal-hearing listeners served as a comparison group. Listeners repeated IEEE sentences in quiet, steady noise, and modulated noise maskers. Maskers were presented at varying signal-to-noise ratios (SNRs) at six modulation rates varying from 1 to 32 Hz. Results suggested that normal-hearing listeners obtain significant release from masking from modulated maskers, especially at 8-Hz masker modulation frequency. In contrast, cochlear implant users experience very little release from masking from modulated maskers. The data suggest, in fact, that they may show negative effects of modulated maskers at syllabic modulation rates (2-4 Hz). Similar patterns of results were obtained from implant listeners using three different devices with different speech-processor strategies. The lack of release from masking occurs in implant listeners independent of their device characteristics, and may be attributable to the nature of implant processing strategies and/or the lack of spectral detail in processed stimuli.

  8. Procedural Factors That Affect Psychophysical Measures of Spatial Selectivity in Cochlear Implant Users

    PubMed Central

    Deeks, John M.; Carlyon, Robert P.

    2015-01-01

    Behavioral measures of spatial selectivity in cochlear implants are important both for guiding the programing of individual users’ implants and for the evaluation of different stimulation methods. However, the methods used are subject to a number of confounding factors that can contaminate estimates of spatial selectivity. These factors include off-site listening, charge interactions between masker and probe pulses in interleaved masking paradigms, and confusion effects in forward masking. We review the effects of these confounds and discuss methods for minimizing them. We describe one such method in which the level of a 125-pps masker is adjusted so as to mask a 125-pps probe, and where the masker and probe pulses are temporally interleaved. Five experiments describe the method and evaluate the potential roles of the different potential confounding factors. No evidence was obtained for off-site listening of the type observed in acoustic hearing. The choice of the masking paradigm was shown to alter the measured spatial selectivity. For short gaps between masker and probe pulses, both facilitation and refractory mechanisms had an effect on masking; this finding should inform the choice of stimulation rate in interleaved masking experiments. No evidence for confusion effects in forward masking was revealed. It is concluded that the proposed method avoids many potential confounds but that the choice of method should depend on the research question under investigation. PMID:26420785

  9. Compensation of overlay errors due to mask bending and non-flatness for EUV masks

    NASA Astrophysics Data System (ADS)

    Chandhok, Manish; Goyal, Sanjay; Carson, Steven; Park, Seh-Jin; Zhang, Guojing; Myers, Alan M.; Leeson, Michael L.; Kamna, Marilyn; Martinez, Fabian C.; Stivers, Alan R.; Lorusso, Gian F.; Hermans, Jan; Hendrickx, Eric; Govindjee, Sanjay; Brandstetter, Gerd; Laursen, Tod

    2009-03-01

    EUV blank non-flatness results in both out of plane distortion (OPD) and in-plane distortion (IPD) [3-5]. Even for extremely flat masks (~50 nm peak to valley (PV)), the overlay error is estimated to be greater than the allocation in the overlay budget. In addition, due to multilayer and other thin film induced stresses, EUV masks have severe bow (~1 um PV). Since there is no electrostatic chuck to flatten the mask during the e-beam write step, EUV masks are written in a bent state that can result in ~15 nm of overlay error. In this article we present the use of physically-based models of mask bending and non-flatness induced overlay errors, to compensate for pattern placement of EUV masks during the e-beam write step in a process we refer to as E-beam Writer based Overlay error Correction (EWOC). This work could result in less restrictive tolerances for the mask blank non-flatness specs which in turn would result in less blank defects.

  10. Cosmic Ballet or Devil's Mask?

    NASA Astrophysics Data System (ADS)

    2004-04-01

    Stars like our Sun are members of galaxies, and most galaxies are themselves members of clusters of galaxies. In these, they move around among each other in a mostly slow and graceful ballet. But every now and then, two or more of the members may get too close for comfort - the movements become hectic, sometimes indeed dramatic, as when galaxies end up colliding. ESO PR Photo 12/04 shows an example of such a cosmic tango. This is the superb triple system NGC 6769-71, located in the southern Pavo constellation (the Peacock) at a distance of 190 million light-years. This composite image was obtained on April 1, 2004, the day of the Fifth Anniversary of ESO's Very Large Telescope (VLT). It was taken in the imaging mode of the VIsible Multi-Object Spectrograph (VIMOS) on Melipal, one of the four 8.2-m Unit Telescopes of the VLT at the Paranal Observatory (Chile). The two upper galaxies, NGC 6769 (upper right) and NGC 6770 (upper left), are of equal brightness and size, while NGC 6771 (below) is about half as bright and slightly smaller. All three galaxies possess a central bulge of similar brightness. They consist of elderly, reddish stars and that of NGC 6771 is remarkable for its "boxy" shape, a rare occurrence among galaxies. Gravitational interaction in a small galaxy group NGC 6769 is a spiral galaxy with very tightly wound spiral arms, while NGC 6770 has two major spiral arms, one of which is rather straight and points towards the outer disc of NGC 6769. NGC 6770 is also peculiar in that it presents two comparatively straight dark lanes and a fainter arc that curves towards the third galaxy, NGC 6771 (below). It is also obvious from this new VLT photo that stars and gas have been stripped off NGC 6769 and NGC 6770, starting to form a common envelope around them, in the shape of a Devil's Mask. There is also a weak hint of a tenuous bridge between NGC 6769 and NGC 6771. All of these features testify to strong gravitational interaction between the three galaxies

  11. High quality mask storage in an advanced Logic-Fab

    NASA Astrophysics Data System (ADS)

    Jähnert, Carmen; Fritsche, Silvio

    2012-02-01

    High efficient mask logistics as well as safe and high quality mask storage are essential requirements within an advanced lithography area of a modern logic waferfab. Fast operational availability of the required masks at the exposure tool with excellent mask condition requires a safe mask handling, safeguarding of high mask quality over the whole mask usage time without any quality degradation and an intelligent mask logistics. One big challenge is the prevention of haze on high advanced phase shift masks used in a high volume production line for some thousands of 248nm or 193nm exposures. In 2008 Infineon Dresden qualified a customer specific developed semi-bare mask storage system from DMSDynamic Micro Systems in combination with a high advanced mask handling and an interconnected complex logistic system. This high-capacity mask storage system DMS M1900.22 for more than 3000 masks with fully automated mask and box handling as well as full-blown XCDA purge has been developed and adapted to the Infineon Lithotoollandscape using Nikon and SMIF reticle cases. Advanced features for ESD safety and mask security, mask tracking via RFID and interactions with the exposure tools were developed and implemented. The stocker is remote controlled by the iCADA-RSM system, ordering of the requested mask directly from the affected exposure tool allows fast access. This paper discusses the advantages and challenges for this approach as well as the practical experience gained during the implementation of the new system which improves the fab performance with respect to mask quality, security and throughput. Especially the realization of an extremely low and stable humidity level in addition with a well controlled air flow at each mask surface, preventing masks from haze degradation and particle contamination, turns out to be a notable technical achievement. The longterm stability of haze critical masks has been improved significantly. Relevant environmental parameters like

  12. Are Masking-Based Models of Risk Useful?

    PubMed

    Gisiner, Robert C

    2016-01-01

    As our understanding of directly observable effects from anthropogenic sound exposure has improved, concern about "unobservable" effects such as stress and masking have received greater attention. Equal energy models of masking such as power spectrum models have the appeal of simplicity, but do they offer biologically realistic assessments of the risk of masking? Data relevant to masking such as critical ratios, critical bandwidths, temporal resolution, and directional resolution along with what is known about general mammalian antimasking mechanisms all argue for a much more complicated view of masking when making decisions about the risk of masking inherent in a given anthropogenic sound exposure scenario. PMID:26610979

  13. Influence of auditory fatigue on masked pure-tone thresholds

    NASA Technical Reports Server (NTRS)

    Parker, D. E.; Tubbs, R. L.; Johnston, P. A.; Johnston, L. S.

    1976-01-01

    A description is presented of four related experiments involving conditions of 3-kHz low-intensity masking, a replication of experiment I with slight variations, 3-kHz high-intensity masking, and 6-kHz low-intensity masking. The frequencies of the tones which the observers detected were 3 and 6 kHz. The observed change in masked-tone threshold as a function of fatigue is discussed. It is found that masked-tone-detection thresholds remain essentially unchanged following fatigue if the masking-noise intensity is sufficiently great.

  14. Approximating the Helium Wavefunction in Positronium-Helium Scattering

    NASA Technical Reports Server (NTRS)

    DiRienzi, Joseph; Drachman, Richard J.

    2003-01-01

    In the Kohn variational treatment of the positronium- hydrogen scattering problem the scattering wave function is approximated by an expansion in some appropriate basis set, but the target and projectile wave functions are known exactly. In the positronium-helium case, however, a difficulty immediately arises in that the wave function of the helium target atom is not known exactly, and there are several ways to deal with the associated eigenvalue in formulating the variational scattering equations to be solved. In this work we will use the Kohn variational principle in the static exchange approximation to d e t e e the zero-energy scattering length for the Ps-He system, using a suite of approximate target functions. The results we obtain will be compared with each other and with corresponding values found by other approximation techniques.

  15. Adaptation to different noninvasive ventilation masks in critically ill patients*

    PubMed Central

    da Silva, Renata Matos; Timenetsky, Karina Tavares; Neves, Renata Cristina Miranda; Shigemichi, Liane Hirano; Kanda, Sandra Sayuri; Maekawa, Carla; Silva, Eliezer; Eid, Raquel Afonso Caserta

    2013-01-01

    OBJECTIVE: To identify which noninvasive ventilation (NIV) masks are most commonly used and the problems related to the adaptation to such masks in critically ill patients admitted to a hospital in the city of São Paulo, Brazil. METHODS: An observational study involving patients ≥ 18 years of age admitted to intensive care units and submitted to NIV. The reason for NIV use, type of mask, NIV regimen, adaptation to the mask, and reasons for non-adaptation to the mask were investigated. RESULTS: We evaluated 245 patients, with a median age of 82 years. Acute respiratory failure was the most common reason for NIV use (in 71.3%). Total face masks were the most commonly used (in 74.7%), followed by full face masks and near-total face masks (in 24.5% and 0.8%, respectively). Intermittent NIV was used in 82.4% of the patients. Adequate adaptation to the mask was found in 76% of the patients. Masks had to be replaced by another type of mask in 24% of the patients. Adequate adaptation to total face masks and full face masks was found in 75.5% and 80.0% of the patients, respectively. Non-adaptation occurred in the 2 patients using near-total facial masks. The most common reason for non-adaptation was the shape of the face, in 30.5% of the patients. CONCLUSIONS: In our sample, acute respiratory failure was the most common reason for NIV use, and total face masks were the most commonly used. The most common reason for non-adaptation to the mask was the shape of the face, which was resolved by changing the type of mask employed. PMID:24068269

  16. A new approach for defect inspection on large area masks

    NASA Astrophysics Data System (ADS)

    Scheuring, Gerd; Döbereiner, Stefan; Hillmann, Frank; Falk, Günther; Brück, Hans-Jürgen

    2007-02-01

    Besides the mask market for IC manufacturing, which mainly uses 6 inch sized masks, the market for the so called large area masks is growing very rapidly. Typical applications of these masks are mainly wafer bumping for current packaging processes, color filters on TFTs, and Flip Chip manufacturing. To expose e.g. bumps and similar features on 200 mm wafers under proximity exposure conditions 9 inch masks are used, while in 300 mm wafer bumping processes (Fig. 1) 14 inch masks are handled. Flip Chip manufacturing needs masks up to 28 by 32 inch. This current maximum mask dimension is expected to hold for the next 5 years in industrial production. On the other hand shrinking feature sizes, just as in case of the IC masks, demand enhanced sensitivity of the inspection tools. A defect inspection tool for those masks is valuable for both the mask maker, who has to deliver a defect free mask to his customer, and for the mask user to supervise the mask behavior conditions during its lifetime. This is necessary because large area masks are mainly used for proximity exposures. During this process itself the mask is vulnerable by contacting the resist on top of the wafers. Therefore a regular inspection of the mask after 25, 50, or 100 exposures has to be done during its whole lifetime. Thus critical resist contamination and other defects, which lead to yield losses, can be recognized early. In the future shrinking feature dimensions will require even more sensitive and reliable defect inspection methods than they do presently. Besides the sole inspection capability the tools should also provide highly precise measurement capabilities and extended review options.

  17. Mask cycle time reduction for foundry projects

    NASA Astrophysics Data System (ADS)

    Balasinski, A.

    2011-11-01

    One of key deliverables of foundry based manufacturing is low cycletime. Building new and enhancing existing products by mask changes involves significant logistical effort, which could be reduced by standardizing data management and communication procedures among design house, mask shop, and foundry (fab) [1]. As an example, a typical process of taping out can take up to two weeks in addition to technical effort, for database handling, mask form completion, management approval, PO signoff and JDV review, translating into loss of revenue. In order to reduce this delay, we are proposing to develop a unified online system which should assist with the following functions: database edits, final verifications, document approvals, mask order entries, and JDV review with engineering signoff as required. This would help a growing number of semiconductor products to be flexibly manufactured at different manufacturing sites. We discuss how the data architecture based on a non-relational database management system (NRDMBS) extracted into a relational one (RDMBS) should provide quality information [2], to reduce cycle time significantly beyond 70% for an example 2 week tapeout schedule.

  18. A new mask exposure and analysis facility

    NASA Astrophysics Data System (ADS)

    te Sligte, Edwin; Koster, Norbert; Deutz, Alex; Staring, Wilbert

    2014-10-01

    The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at high EUV powers and intensities, and capable of exposing and analyzing EUV masks. The proposed system architecture is similar to the EBL system which has been operated jointly by TNO and Carl Zeiss SMT since 2005. EBL2 contains an EUV Beam Line, in which samples can be exposed to EUV irradiation in a controlled environment. Attached to this Beam Line is an XPS system, which can be reached from the Beam Line via an in-vacuum transfer system. This enables surface analysis of exposed masks without breaking vacuum. Automated handling with dual pods is foreseen so that exposed EUV masks will still be usable in EUV lithography tools to assess the imaging impact of the exposure. Compared to the existing system, large improvements in EUV power, intensity, reliability, and flexibility are proposed. Also, in-situ measurements by e.g. ellipsometry is foreseen for real time monitoring of the sample condition. The system shall be equipped with additional ports for EUVR or other analysis tools. This unique facility will be open for external customers and other research groups.

  19. Recent improvements in the MODIS cloud mask

    NASA Astrophysics Data System (ADS)

    Frey, Richard A.; Ackerman, Steven A.; Liu, Yinghui; Strabala, Kathleen I.; Zhang, Hong

    2004-12-01

    Significant improvements have been made to the MODIS cloud mask (MOD35) in preparation for Collection 5 reprocessing and forward stream data production. Most of the modifications are realized for nighttime scenes where polar and oceanic regions will see marked improvement. For polar night scenes, two new spectral tests using the 7.2 μm water vapor absorption band have been added as well as updates to the 3.9-12 μm and 11-12 μm cloud tests. More non-MODIS ancillary data has been added for nighttime processing. Land and sea surface temperature maps provide crucial information for middle and low-level cloud detection and lessen dependence on ocean variability tests. Sun-glint areas are also improved by use of sea surface temperatures to aid in resolving observations with conflicting cloud vs. clear-sky signals, where visible and NIR reflectances are high, but infrared brightness temperatures are relatively warm. Details and examples of new and modified cloud tests are shown and various methods employed to evaluate the new cloud mask results. Day vs. night sea surface temperatures derived from MODIS radiances and using only the MODIS cloud mask for cloud screening are contrasted. Frequencies of cloud from sun-glint regions will be shown as a function of sun-glint angle to gain a sense of cloud mask quality in those regions.

  20. The laryngeal mask airway in obstetrical anaesthesia.

    PubMed

    Gataure, P S; Hughes, J A

    1995-02-01

    The laryngeal mask airway (LMA) has been used extensively to provide a safe airway in spontaneously breathing patients who are not at risk from aspiration of gastric contents. The role of the LMA in the event of a failed intubation in an obstetrical patient, and its place in a failed intubation drill remains unclear. Two hundred and fifty consultant obstetric anaesthetists in the United Kingdom were asked to complete an anonymous questionnaire regarding their views about using the laryngeal mask airway (LMA) in obstetrical anaesthesia. The LMA was available in 91.4% of obstetric units. Seventy-two per cent of anaesthetists were in favour of using the LMA to maintain oxygenation when tracheal intubation had failed and ventilation using a face mask was inadequate. Twenty-four respondents had had personal experience with the LMA in obstetrical anaesthesia, eight of whom stated that the LMA had proved to be a lifesaver. We believe that the LMA has a role in obstetrical anaesthesia when tracheal intubation has failed and ventilation using a face mask proves to be impossible, and it should be inserted before attempting cricothyroidectomy. PMID:7720155

  1. Associative Learning of Discrimination with Masked Stimuli

    ERIC Educational Resources Information Center

    Marcos, Jose L.

    2007-01-01

    Great controversy exists on whether associative learning occurs without awareness. In Experiment 1, 31 participants received discrimination training by repeated presentations of two stimulus sequences (S1[subscript A] right arrow S2[subscript A], and S1[subscript B] right arrow S2[subscript B]), S1 being a masked stimulus. S2 were imperative…

  2. Testing Tactile Masking between the Forearms.

    PubMed

    D'Amour, Sarah; Harris, Laurence R

    2016-01-01

    Masking, in which one stimulus affects the detection of another, is a classic technique that has been used in visual, auditory, and tactile research, usually using stimuli that are close together to reveal local interactions. Masking effects have also been demonstrated in which a tactile stimulus alters the perception of a touch at a distant location. Such effects can provide insight into how components of the body's representations in the brain may be linked. Occasional reports have indicated that touches on one hand or forearm can affect tactile sensitivity at corresponding contralateral locations. To explore the matching of corresponding points across the body, we can measure the spatial tuning and effect of posture on contralateral masking. Careful controls are required to rule out direct effects of the remote stimulus, for example by mechanical transmission, and also attention effects in which thresholds may be altered by the participant's attention being drawn away from the stimulus of interest. The use of this technique is beneficial as a behavioural measure for exploring which parts of the body are functionally connected and whether the two sides of the body interact in a somatotopic representation. This manuscript describes a behavioural protocol that can be used for studying contralateral tactile masking. PMID:26889736

  3. Defect printability in CPL mask technology

    NASA Astrophysics Data System (ADS)

    Kuijten, Jan-Pieter; Verhappen, Arjan; Pijnenburg, Wil; Conley, Will; Litt, Lloyd C.; Wu, Wei; Montgomery, Patrick; Roman, Bernard J.; Kasprowicz, Bryan S.; Progler, Christopher J.; Socha, Robert J.; Van Den Broeke, Douglas J.; Schaefer, Erika; Cook, Pat

    2004-05-01

    Each generation of semiconductor device technology drive new and interesting resolution enhancement technology (RET"s). The race to smaller and smaller geometry"s has forced device manufacturers to k1"s approaching 0.40. The authors have been investigating the use of Chromeless phase-shifting masks (CPL) exposed with ArF, high numerical aperture (NA), and off-axis illumination (OAI) has been shown to produce production worthy sub-100nm resist patterns with acceptable overlapped process window across feature pitch. These new reticle technologies have many issues that are similar to simple binary masks. The authors have investigated the printability of defects in CPL mask technology. Programmed defects of various sizes and types have been simulated and printed for sub 100nm imaging. High resolution scanning electron microscopy has been used to characterize these defects and develop an understanding of size and type that prints. In this paper the authors will focus on image line end shortening and the impact of through dose and focus performance for very high NA ArF imaging. The authors have built a number of test structures that require superior 2D control for SRAM gate structures. Various types of line ends have been evaluated for either straight CPL mask or hybrid type builds.

  4. Continuous and Localized Mn Implantation of ZnO

    PubMed Central

    2009-01-01

    We present results derived from continuous and localized 35 keV55Mn+ion implantations into ZnO. Localized implantations were carried out by using self-ordered alumina membranes as masks leading to ordered arrays of implanted volumes on the substrate surfaces. Defects and vacancies in the small implantation volumes of ZnO were generated due to the implantation processes besides the creation of new phases. Rapid thermal annealing was applied in the case of continuous implantation. The samples were characterized by HRSEM, GIXRD, Raman spectroscopy and RBS/C. Magnetic characterization of the samples pointed out appreciable differences among the samples obtained by the different implantation methods. This fact was mainly attributed to the different volume/surface ratios present in the implanted zones as well as to the increase of Mn atom concentrations along the grain frontiers in the nanostructured surfaces. The samples also showed a ferromagnetic transition phase at temperature value higher than room temperature. PMID:20596285

  5. Superfluid helium leak sealant study

    NASA Technical Reports Server (NTRS)

    Vorreiter, J. W.

    1981-01-01

    Twenty-one leak specimens were fabricated in the ends of stainless steel and aluminum tubes. Eighteen of these tubes were coated with a copolymer material to seal the leak. The other three specimens were left uncoated and served as control specimens. All 21 tubes were cold shocked in liquid helium 50 times and then the leak rate was measured while the tubes were submerged in superfluid helium at 1.7 K. During the cold shocks two of the coated specimens were mechanically damaged and eliminated from the test program. Of the remaining 16 coated specimens one suffered a total coating failure and resulting high leak rate. Another three of the coated specimens suffered partial coating failures. The leak rates of the uncoated specimens were also measured and reported. The significance of various leak rates is discussed in view of the infrared astronomical satellite (IRAS) Dewar performance.

  6. Confined helium on Lagrange meshes.

    PubMed

    Baye, D; Dohet-Eraly, J

    2015-12-21

    The Lagrange-mesh method has the simplicity of a calculation on a mesh and can have the accuracy of a variational method. It is applied to the study of a confined helium atom. Two types of confinement are considered. Soft confinements by potentials are studied in perimetric coordinates. Hard confinement in impenetrable spherical cavities is studied in a system of rescaled perimetric coordinates varying in [0,1] intervals. Energies and mean values of the distances between electrons and between an electron and the helium nucleus are calculated. A high accuracy of 11 to 15 significant figures is obtained with small computing times. Pressures acting on the confined atom are also computed. For sphere radii smaller than 1, their relative accuracies are better than 10(-10). For larger radii up to 10, they progressively decrease to 10(-3), still improving the best literature results. PMID:25732054

  7. The fabrication of silicon nanostructures by focused-ion-beam implantation and TMAH wet etching.

    PubMed

    Sievilä, Päivi; Chekurov, Nikolai; Tittonen, Ilkka

    2010-04-01

    Local gallium implantation of silicon by a focused ion beam (FIB) has been used to create a mask for anisotropic tetramethylammonium hydroxide (TMAH) wet etching. The dependence of the etch stop properties of gallium-doped silicon on the implanted dose has been investigated and a dose of 4 x 10(13) ions cm(- 2) has been determined to be the threshold value for achieving observable etching resistance. Only a thin, approx. 50 nm, surface layer is found to be durable enough to serve as a mask with a high selectivity of at least 2000:1 between implanted and non-implanted areas. The combined FIB-TMAH process has been used to generate various types of 3D nanostructures including nanochannels separated by thin vertical sidewalls with aspect ratios up to 1:30, ultra-narrow (approx. 25 nm) freestanding bridges and cantilevers, and gratings with a resolution of 20 lines microm(- 1). PMID:20215652

  8. The fabrication of silicon nanostructures by focused-ion-beam implantation and TMAH wet etching

    NASA Astrophysics Data System (ADS)

    Sievilä, Päivi; Chekurov, Nikolai; Tittonen, Ilkka

    2010-04-01

    Local gallium implantation of silicon by a focused ion beam (FIB) has been used to create a mask for anisotropic tetramethylammonium hydroxide (TMAH) wet etching. The dependence of the etch stop properties of gallium-doped silicon on the implanted dose has been investigated and a dose of 4 × 1013 ions cm - 2 has been determined to be the threshold value for achieving observable etching resistance. Only a thin, approx. 50 nm, surface layer is found to be durable enough to serve as a mask with a high selectivity of at least 2000:1 between implanted and non-implanted areas. The combined FIB-TMAH process has been used to generate various types of 3D nanostructures including nanochannels separated by thin vertical sidewalls with aspect ratios up to 1:30, ultra-narrow (approx. 25 nm) freestanding bridges and cantilevers, and gratings with a resolution of 20 lines µm - 1.

  9. Proton implantation for the isolation of AlGaAs/GaAs quantum cascade lasers

    NASA Astrophysics Data System (ADS)

    Szerling, A.; Kosiel, K.; Kozubal, M.; Myśliwiec, M.; Jakieła, R.; Kuc, M.; Czyszanowski, T.; Kruszka, R.; Pągowska, K.; Karbownik, P.; Barcz, A.; Kamińska, E.; Piotrowska, A.

    2016-07-01

    The novel fabrication scheme of the mid-infrared (∼9.5 μm) Al0.45Ga0.55As/GaAs plasmon-enhanced-waveguide quantum cascade laser (QCL) is reported. The electric isolation was made exclusively by 6.5 μm-deep proton implantation. The applied implantation allowed us to suppress the current spreading and at the same time enabled the laser radiation confinement without any mesa formation. A galvanic gold layer at least 3.5 μm thick covering the top ohmic contact was used as a mask for implantation. This mask was not removed after the implantation, but it served for heat spreading from the laser. A considerable reduction in the necessary technological steps was obtained with the presented novel fabrication scheme, in comparison with the standard mesa-etching-based method.

  10. Laser Cooling of Metastable Helium

    NASA Astrophysics Data System (ADS)

    Chuang, Ti.

    An experiment on the laser cooling of a metastable helium beam has been carried out. This experiment is appropriate to be described theoretically under a semiclassical framework. The experiment is the first phase of a large experimental project, whose ultimate goal is to investigate the behavior of laser -cooled metastable helium atoms in the quantum mechanical domain. This first phase is to provide the foundation for the second phase, which will be described in a full quantum mechanical framework. To reach this goal, an atomic beam source and a detection and data acquisition system were designed and constructed to be used in both phases. A laser system that is necessary for the first phase was also designed and constructed. This experiment was designed so that the studies of the atomic behavior, both in the semiclassical and quantum mechanical regions, can be investigated almost simultaneously. This experiment mainly consists of a one-dimensional transverse Doppler cooling of a metastable helium beam. The theory of Doppler cooling, based upon previous work of others, is discussed in this thesis as well. A final velocity width (HWHM) of ~0.62 m/s has been achieved, which is about 2.5 times larger than the Doppler velocity predicted by the theory. The two most likely reasons for not obtaining the Doppler velocity have been carefully examined. Sub-Doppler cooling of the helium beam was also tried, but was unsuccessful. It is our belief that the very same reasons prevent us from achieving sub -Doppler cooling as well.

  11. Helium in interplanetary dust particles

    NASA Technical Reports Server (NTRS)

    Nier, A. O.; Schlutter, D. J.

    1993-01-01

    Helium and neon were extracted from fragments of individual stratosphere-collected interplanetary dust particles (IDP's) by subjecting them to increasing temperature by applying short-duration pulses of power in increasing amounts to the ovens containing the fragments. The experiment was designed to see whether differences in release temperatures could be observed which might provide clues as to the asteroidal or cometary origin of the particles. Variations were observed which show promise for elucidating the problem.

  12. Detecting scintillations in liquid helium

    NASA Astrophysics Data System (ADS)

    Huffman, P. R.; McKinsey, D. N.

    2013-09-01

    We review our work in developing a tetraphenyl butadiene (TPB)-based detection system for a measurement of the neutron lifetime using magnetically confined ultracold neutrons (UCN). As part of the development of the detection system for this experiment, we studied the scintillation properties of liquid helium itself, characterized the fluorescent efficiencies of different fluors, and built and tested three detector geometries. We provide an overview of the results from these studies as well as references for additional information.

  13. Superfluid Helium Tanker (SFHT) study

    NASA Technical Reports Server (NTRS)

    Eberhardt, Ralph N.; Dominick, Sam M.; Anderson, John E.; Gille, John P.; Martin, Tim A.; Marino, John S.; Paynter, Howard L.; Traill, R. Eric; Herzl, Alfred; Gotlib, Sam

    1988-01-01

    Replenishment of superfluid helium (SFHe) offers the potential of extending the on-orbit life of observatories, satellite instruments, sensors and laboratories which operate in the 2 K temperature regime. A reference set of resupply customers was identified as representing realistic helium servicing requirements and interfaces for the first 10 years of superfluid helium tanker (SFHT) operations. These included the Space Infrared Telescope Facility (SIRTF), the Advanced X-ray Astrophysics Facility (AXAF), the Particle Astrophysics Magnet Facility (Astromag), and the Microgravity and Materials Processing Sciences Facility (MMPS)/Critical Point Phenomena Facility (CPPF). A mixed-fleet approach to SFHT utilization was considered. The tanker permits servicing from the Shuttle cargo bay, in situ when attached to the OMV and carried to the user spacecraft, and as a depot at the Space Station. A SFHT Dewar ground servicing concept was developed which uses a dedicated ground cooling heat exchanger to convert all the liquid, after initial fill as normal fluid, to superfluid for launch. This concept permits the tanker to be filled to a near full condition, and then cooled without any loss of fluid. The final load condition can be saturated superfluid with any desired ullage volume, or the tank can be totally filed and pressurized. The SFHT Dewar and helium plumbing system design has sufficient component redundancy to meet fail-operational, fail-safe requirements, and is designed structurally to meet a 50 mission life usage requirement. Technology development recommendations were made for the selected SFHT concept, and a Program Plan and cost estimate prepared for a phase C/D program spanning 72 months from initiation through first launch in 1997.

  14. Infrared Signature Masking by Air Plasma Radiation

    NASA Technical Reports Server (NTRS)

    Kruger, C. H.; Laux, C. O.

    1998-01-01

    This report describes progress during the second year of our research program on Infrared Signature Masking by Air Plasmas at Stanford University. This program is intended to investigate the masking of infrared signatures by the air plasma formed behind the bow shock of high velocity missiles. Our previous annual report described spectral measurements and modeling of the radiation emitted between 3.2 and 5.5 microns by an atmospheric pressure air plasma in chemical and thermal equilibrium at a temperature of approximately 3100 K. One of our goals was to examine the spectral emission of secondary species such as water vapor or carbon dioxide. The cold air stream injected in the plasma torch contained approximately 330 parts per million Of CO2, which is the natural CO2 concentration in atmospheric air at room temperature, and a small amount of water vapor with an estimated mole fraction of 3.8 x 10(exp -4). As can be seen from Figure 1, it was found that the measured spectrum exhibited intense spectral features due to the fundamental rovibrational bands of NO at 4.9 - 5.5 microns and the V(3) band of CO2 (antisymmetric stretch) at 4.2-4.8 microns. These observations confirmed the well-known fact that infrared signatures between 4.15 - 5.5 microns can be masked by radiative emission in the interceptor's bow-shock. Figure I also suggested that the range 3.2 - 4.15 microns did not contain any significant emission features (lines or continuum) that could mask IR signatures. However, the signal-to-noise level, close to one in that range, precluded definite conclusions. Thus, in an effort to further investigate the spectral emission in the range of interest to signature masking problem, new measurements were made with a higher signal-to-noise ratio and an extended wavelength range.

  15. Vorticity matching in superfluid helium

    NASA Astrophysics Data System (ADS)

    Samuels, David C.

    1991-12-01

    Recent experiments have rekindled interest in high Reynolds number flows using superfluid helium. In a continuing series of experiments, the flow of helium II through various devices (smooth pipes, corrugated pipes, valves, venturies, turbine flowmeters, and coanda flowmeters for example) was investigated. In all cases, the measured values (typically, mass flow rates and pressure drops) were found to be well described by classical relations for high Reynolds flows. This is unexpected since helium II consists of two interpenetrating fluids; one fluid with nonzero viscosity (the normal fluid) and one with zero viscosity (the superfluid). Only the normal fluid component should directly obey classical relations. Since the experiments listed above only measure the external behavior of the flow (i.e., pressure drops over devices), there is a great deal of room for interpretation of their results. One possible interpretation is that in turbulent flows the normal fluid and the superfluid velocity fields are somehow 'locked' together, presumably by the mutual friction force between the superfluid vortex filaments and the normal fluid. We refer to this locking together of the two fluids as 'vorticity matching.'

  16. Sensorimotor supremacy: Investigating conscious and unconscious vision by masked priming

    PubMed Central

    Ansorge, Ulrich; Neumann, Odmar; Becker, Stefanie I.; Kälberer, Holger; Cruse, Holk

    2008-01-01

    According to the sensorimotor supremacy hypothesis, conscious perception draws on motor action. In the present report, we will sketch two lines of potential development in the field of masking research based on the sensorimotor supremacy hypothesis. In the first part of the report, evidence is reviewed that masked, invisible stimuli can affect motor responses, attention shifts, and semantic processes. After the review of the corresponding evidence – so-called masked priming effects – an approach based on the sensorimotor supremacy hypothesis is detailed as to how the question of a unitary mechanism of unconscious vision can be pursued by masked priming studies. In the second part of the report, different models and theories of backward masking and masked priming are reviewed. Types of models based on the sensorimotor hypothesis are discussed that can take into account ways in which sensorimotor processes (reflected in masked priming effects) can affect conscious vision under backward masking conditions. PMID:20517513

  17. Lithographic performance evaluation of a contaminated EUV mask after cleaning

    SciTech Connect

    George, Simi; Naulleau, Patrick; Okoroanyanwu, Uzodinma; Dittmar, Kornelia; Holfeld, Christian; Wuest, Andrea

    2009-11-16

    The effect of surface contamination and subsequent mask surface cleaning on the lithographic performance of a EUV mask is investigated. SEMATECH's Berkeley micro-field exposure tool (MET) printed 40 nm and 50 nm line and space (L/S) patterns are evaluated to compare the performance of a contaminated and cleaned mask to an uncontaminated mask. Since the two EUV masks have distinct absorber architectures, optical imaging models and aerial image calculations were completed to determine any expected differences in performance. Measured and calculated Bossung curves, process windows, and exposure latitudes for the two sets of L/S patterns are compared to determine how the contamination and cleaning impacts the lithographic performance of EUV masks. The observed differences in mask performance are shown to be insignificant, indicating that the cleaning process did not appreciably affect mask performance.

  18. A rate theory study of helium bubble formation and retention in Cu-Nb nanocomposites

    NASA Astrophysics Data System (ADS)

    Dunn, A. Y.; McPhie, M. G.; Capolungo, L.; Martinez, E.; Cherkaoui, M.

    2013-04-01

    A spatially dependent rate theory model for helium migration, clustering, and trapping on interfaces between Cu and Nb layers is introduced to predict the evolution of the concentrations of He clusters of various sizes during implantation and early annealing. Migration and binding energies of point defects and small clusters in bulk Cu and Nb are found using conjugate gradient minimization and the nudged elastic band method. This model is implemented in a three-dimensional framework and used to predict the relationship between helium bubble formation and the nano-composite microstructure, including interfacial free volume, grain size, and layer thickness. Interstitial and vacancy-like migration of helium is considered. The effects of changing layer thickness and interfacial misfit dislocation density on the threshold for helium bubble nucleation are found to match experiments. Accelerated helium release due to interfaces and grain boundaries is shown to occur only when diffusion rates on interfaces and grain boundaries are greatly increased relative to the bulk material.

  19. Mask-holding mechanism for an e-beam x-ray mask writer

    NASA Astrophysics Data System (ADS)

    Kunioka, Tatsuya; Shimazu, Nobuo; Shimizu, Akira; Sakai, Tomoaki; Kuriyama, Youichi

    1995-07-01

    For high absolute pattern placement accuracy and high throughput in x- ray mask writing, it is very important to firmly hold the mask with little holding deformation and large thermal conduction. For these purposes we have developed a new 'triple-chuck' mask holding mechanism. This triple-chuck mechanism is a hybrid of three-point-contact and conventional electrostatic-chuck holding mechanism, and, as the name implies, it uses three small-area electrostatic chucks. To determine the suitable shape, area, and position of the electrostatic chucks, we performed deformation simulation using the finite element method, and also conducted thermal conduction simulations. The results suggested that the triple-chuck mechanism could attain targets set for an x-ray mask with a feature size of 0.2 micrometers . Accordingly, we installed the new holding mechanism in the EB-X1 writer and found that when holding 3-inch mask (2-mm thick, before bulk etching), there is no microslippage between the mask and holding mechanism when the XY-stage is moved with an acceleration of 0.3 G and the maximum holding deformation is 0.22 micrometers in a 25-mm-square patterning area. This corresponds to the absolute pattern placement accuracy degradation of less than 11 nm in the patterning area. About 30 minutes pass before the mask temperature is within 0.1 degree of the holding-mechanism temperature. This was determined by two different methods: a patterning method and marek detection. These experimental results confirmed the triple-chuck holding mechanism attained the targets set for an x-ray mask with a feature size of 0.2 micrometers .

  20. Retrograde peri-implantitis.

    PubMed

    Mohamed, Jumshad B; Shivakumar, B; Sudarsan, Sabitha; Arun, K V; Kumar, T S S

    2010-01-01

    Retrograde peri-implantitis constitutes an important cause for implant failure. Retrograde peri-implantitis may sometimes prove difficult to identify and hence institution of early treatment may not be possible. This paper presents a report of four cases of (the implant placed developing to) retrograde peri-implantitis. Three of these implants were successfully restored to their fully functional state while one was lost due to extensive damage. The paper highlights the importance of recognizing the etiopathogenic mechanisms, preoperative assessment, and a strong postoperative maintenance protocol to avoid retrograde peri-implant inflammation. PMID:20922082

  1. EUV mask infrastructure readiness and gaps for TD and HVM

    NASA Astrophysics Data System (ADS)

    Liang, Ted; Magana, John; Chakravorty, Kishore; Panning, Eric; Zhang, Guojing

    2015-10-01

    The industry is transitioning EUV lithography from feasibility phase to technology development. EUV mask infrastructure needs to be prepared to support the technology development and ready to enable the implementation of EUV lithography for production. In this paper, we review the current status and assess the readiness of key infrastructure modules in EUV mask fabrication, inspection and control, and usage in a mask cycle: blank quality and inspection, pattern inspection, defect disposition and repair, pellicle integration, and handling of pelliclized masks.

  2. Automated mask creation from a 3D model using Faethm.

    SciTech Connect

    Schiek, Richard Louis; Schmidt, Rodney Cannon

    2007-11-01

    We have developed and implemented a method which given a three-dimensional object can infer from topology the two-dimensional masks needed to produce that object with surface micro-machining. The masks produced by this design tool can be generic, process independent masks, or if given process constraints, specific for a target process. This design tool calculates the two-dimensional mask set required to produce a given three-dimensional model by investigating the vertical topology of the model.

  3. Evaluation of non-actinic EUV mask inspection and defect printability on multiple EUV mask absorbers

    NASA Astrophysics Data System (ADS)

    Badger, Karen; Gallagher, Emily; Seki, Kazunori; McIntyre, Gregory; Konishi, Toshio; Kodera, Yutaka; Redding, Vincent

    2013-06-01

    EUV wavelength inspection tools are several years away from product release. Until then, the EUV Lithography (EUVL) community faces the challenge of inspecting EUV masks at non-actinic wavelengths. It is critical to understand how to improve mask inspectability and defect sensitivity. The absorber stack is one contributor, since changing the film stack modifies image contrast. To study the effect, masks were fabricated from three different film stacks on which the thickness of the low reflective and absorber layers vary. These three absorbers are identified in this paper as Type A, Type B and Type C. All blanks had the same Ru-capped multi-layer substrate beneath the absorber stack. Inspection contrast, defect sensitivity and inspectability were measured on a 193nm wavelength inspection tool. The focus of this paper will be on inspection at the 193nm wavelength; however, simulated wafer results at the 13.5 nm EUV exposure wavelength will be included to anchor the relevance of the mask inspection results. A comparison of the different absorber stacks, the ability to detect defects on the various masks, and how defects on these substrates prints on wafer will be provided. This work addresses the gap between EUVL mask inspection and wafer defect printability and how the two views differ relative to various absorber stacks.

  4. Fine pattern fabrication property of binary mask and attenuated phase shift mask

    NASA Astrophysics Data System (ADS)

    Yamazaki, Taichi; Kojima, Yosuke; Yamana, Mitsuharu; Haraguchi, Takashi; Tanaka, Tsuyoshi

    2009-04-01

    For 45nm and 32nm node technology, the challenges for resolution and CD control of mask patterns become the steeper mountain path. Especially, Sub Resolution Assist Feature (SRAF) is the smallest pattern on mask and amplifies the difficulty of mask fabrication. In order to improve the resolution of fine patterns, the influence of wet processing cannot be neglected, because it causes the pattern collapsing. Wet processing of mask-making can be divided into resist development and cleaning. In this study, the root causes of pattern collapsing are investigated at each wet processing. It is confirmed that thin resist can enhance the resolution limit of resist pattern and hard-mask blank, such as OMOG: Opaque MoSi On Glass, is suitable for thinner resist under 1500A. The pattern collapsing of OMOG is compared with that of Att.PSM at the cleaning before and after Cr stripping. Mask inspection finds that pattern collapsing can be suppressed by OMOG at both cleanings. It is because OMOG has lower cleaning stress than Att.PSM due to lower aspect-ratio. This benefit is demonstrated by cleaning stress simulation. Additionally, it is found that the SRAF size of OMOG can be wider than Att.PSM by optical simulation. From these results, OMOG has much advantage of fine pattern fabrication and is the optimal blank for 32nm node and beyond.

  5. Variation in Atmospheric Helium Isotopes

    NASA Astrophysics Data System (ADS)

    Mabry, J. C.; Marty, B.; Burnard, P.; Blard, P.

    2010-12-01

    Anthropogenic activity such as oil and gas exploitation releases crustal helium, which has excess 4He compared to atmospheric helium. This may give rise to both spatial and temporal variations in the atmospheric 3He/4He. Helium is present in trace quantities in the air (5 ppm) and has a very low ratio (3He/4Heair = 1.38 x 10-6), consequently high precision measurements of atmospheric He presents a significant analytical challenge. Recent work by Sano et al. [1] has endeavored to experimentally quantify these potential variations in the atmospheric 3He/4He by measuring the helium isotopes from air samples collected around the globe and from samples of ancient trapped atmosphere. Their results indicate an increase in the atmospheric 3He/4He from northern to southern latitudes of the order 2 - 4 ‰, which they attribute to greater use of fossil fuels in the northern hemisphere. However, since most of their data points overlap at the 2-3 ‰ (2σ) level, additional measurements (with increased precision if possible) are needed. We have constructed an automated extraction line dedicated to measuring He in samples of air which can rapidly switch between measuring aliquots of sample with standards. It additionally features an adjustable bellows on the sample aliquot volume that enables us to adjust the size of a sample aliquot to precisely match the standard, eliminating biases arising from nonlinear pressure effects in the mass spectrometer. The measurements are made using a Helix SFT multi-collector mass spectrometer. At present, repeat measurements of 3He/4He from our standard (purified air) have a reproducibility of 2‰ (2σ), while measurements of local (Nancy, France) air samples have a reproducibility of 3He/4He of 3‰ (2σ), which are at a similar level to the uncertainties reported by Sano. Modifications are underway to improve 3He measurements which are the principal source of error. We have collected atmospheric samples from around the globe over a wide

  6. 42 CFR 84.111 - Gas masks; required components.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... 42 Public Health 1 2010-10-01 2010-10-01 false Gas masks; required components. 84.111 Section 84.111 Public Health PUBLIC HEALTH SERVICE, DEPARTMENT OF HEALTH AND HUMAN SERVICES OCCUPATIONAL SAFETY AND HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.111 Gas masks; required components. (a) Each...

  7. 42 CFR 84.117 - Gas mask containers; minimum requirements.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... 42 Public Health 1 2010-10-01 2010-10-01 false Gas mask containers; minimum requirements. 84.117 Section 84.117 Public Health PUBLIC HEALTH SERVICE, DEPARTMENT OF HEALTH AND HUMAN SERVICES OCCUPATIONAL SAFETY AND HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.117 Gas mask containers;...

  8. Does "Darkness" Lead to "Happiness"? Masked Suffix Priming Effects

    ERIC Educational Resources Information Center

    Dunabeitia, Jon Andoni; Perea, Manuel; Carreiras, Manuel

    2008-01-01

    Masked affix priming effects have usually been obtained for words sharing the initial affix (e.g., "reaction"-"REFORM"). However, prior evidence on masked suffix priming effects (e.g., "baker"-"WALKER") is inconclusive. In the present series of masked priming lexical decision experiments, a target word was briefly preceded by a morphologically or…

  9. 21 CFR 868.5550 - Anesthetic gas mask.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Anesthetic gas mask. 868.5550 Section 868.5550...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5550 Anesthetic gas mask. (a) Identification. An anesthetic gas mask is a device, usually made of conductive rubber, that is positioned over...

  10. 21 CFR 868.5550 - Anesthetic gas mask.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Anesthetic gas mask. 868.5550 Section 868.5550...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5550 Anesthetic gas mask. (a) Identification. An anesthetic gas mask is a device, usually made of conductive rubber, that is positioned over...

  11. 21 CFR 868.5550 - Anesthetic gas mask.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Anesthetic gas mask. 868.5550 Section 868.5550...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5550 Anesthetic gas mask. (a) Identification. An anesthetic gas mask is a device, usually made of conductive rubber, that is positioned over...

  12. 21 CFR 868.5550 - Anesthetic gas mask.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 8 2014-04-01 2014-04-01 false Anesthetic gas mask. 868.5550 Section 868.5550...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5550 Anesthetic gas mask. (a) Identification. An anesthetic gas mask is a device, usually made of conductive rubber, that is positioned over...

  13. 21 CFR 868.5550 - Anesthetic gas mask.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 8 2012-04-01 2012-04-01 false Anesthetic gas mask. 868.5550 Section 868.5550...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5550 Anesthetic gas mask. (a) Identification. An anesthetic gas mask is a device, usually made of conductive rubber, that is positioned over...

  14. Application of calibration masks to TV vidicon tube

    NASA Technical Reports Server (NTRS)

    Brawner, E. L.; Brown, J. J.; Jonker, W. J.

    1971-01-01

    Photographic application method devised for overlaying test pattern masks on TV camera vidicon tubes prints the mask within 0.0076 cm of the vertical and horizontal center lines of the tube face. Entire process, including mask fabrication and alignment procedure, requires less than 10 minutes.

  15. 42 CFR 84.111 - Gas masks; required components.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 42 Public Health 1 2014-10-01 2014-10-01 false Gas masks; required components. 84.111 Section 84.111 Public Health PUBLIC HEALTH SERVICE, DEPARTMENT OF HEALTH AND HUMAN SERVICES OCCUPATIONAL SAFETY....111 Gas masks; required components. (a) Each gas mask described in § 84.110 shall, where its...

  16. On the Nature of Phonological Assembly: Evidence from Backward Masking.

    ERIC Educational Resources Information Center

    Perry, Conrad; Ziegler, Johannes C.

    2002-01-01

    Used backward masking paradigm to investigate nature and time course of phonological assembly. Two experiments examined to what extent phonological assembly is a serial process. One showed recognition rates in a backward masking task varied as a function of the serial position of phonemes that were shared between backward masks and target words;…

  17. Attributes of tinnitus and the acceptance of masking.

    PubMed

    Vernon, J; Griest, S; Press, L

    1990-01-01

    Various characteristics of tinnitus were surveyed to determine whether they were associated with the acceptance of masking, which is used as a relief procedure for tinnitus. The characteristics considered were duration, loudness match, minimum masking level, and residual inhibition. Data for the characteristics of tinnitus were obtained from the Tinnitus Data Registry at the Oregon Hearing Research Center, which contains information on 784 tinnitus patients. The acceptance of masking was determined by each individual patient based on actual tests with wearable masking units. Variations in the individual characteristics listed above were not found to be significantly associated with the acceptance of masking and thus should not be used a priori to deny patients the opportunity for possible relief of their tinnitus. A masking indicator was found to be significantly (P = .03) associated with the acceptance of masking. This masking indicator is obtained by subtracting the loudness match of the tinnitus from the minimum masking level. When the masking indicator was 10 dB or less, the acceptance of masking was in excess of 50%. The data presented may help to dispel some current misconceptions about the masking of tinnitus. PMID:2181884

  18. Homophone Dominance Modulates the Phonemic-Masking Effect.

    ERIC Educational Resources Information Center

    Berent, Iris; Van Orden, Guy C.

    2000-01-01

    Finds (1) positive phonemic-masking effects occurred for dominant homophones; (2) null phonemic-masking effects occurred for subordinate homophones; and (3) subordinate homophones were much more likely to be falsely identified as their dominant mate. Suggests the source of these null phonemic-masking is itself a phonology effect. Concludes…

  19. Dose dependence of helium bubble formation in nano-engineered SiC at 700 °C

    NASA Astrophysics Data System (ADS)

    Chen, C.-H.; Zhang, Y.; Wang, Y.; Crespillo, M. L.; Fontana, C. L.; Graham, J. T.; Duscher, G.; Shannon, S. C.; Weber, W. J.

    2016-04-01

    Knowledge of radiation-induced helium bubble nucleation and growth in SiC is essential for applications in fusion and fission environments. Here we report the evolution of microstructure in nano-engineered (NE) 3C SiC, pre-implanted with helium, under heavy ion irradiation at 700 °C up to doses of 30 displacements per atom (dpa). Elastic recoil detection analysis confirms that the as-implanted helium depth profile does not change under irradiation to 30 dpa at 700 °C. While the helium bubble size distribution becomes narrower with increasing dose, the average size of bubbles remains unchanged and the density of bubbles increases somewhat with dose. These results are consistent with a long helium bubble incubation process under continued irradiation at 700 °C up to 30 dpa, similar to that reported under dual and triple beam irradiation at much higher temperatures. The formation of bubbles at this low temperature is enhanced by the nano-layered stacking fault structure in the NE SiC, which enhances point defect mobility parallel to the stacking faults. This stacking fault structure is stable at 700 °C up to 30 dpa and suppresses the formation of dislocation loops normally observed under these irradiation conditions.

  20. Dose dependence of helium bubble formation in nano-engineered SiC at 700 °C

    DOE PAGESBeta

    Chen, Chien -Hung; Zhang, Yanwen; Wang, Yongqiang; Crespillo, Miguel L.; Fontana, Cristiano L.; Graham, Joseph T.; Duscher, Gerd; Shannon, Steven C.; Weber, William J.

    2016-02-03

    Knowledge of radiation-induced helium bubble nucleation and growth in SiC is essential for applications in fusion and fission environments. Here we report the evolution of microstructure in nano-engineered (NE) 3C SiC, pre-implanted with helium, under heavy ion irradiation at 700 °C up to doses of 30 displacements per atom (dpa). Elastic recoil detection analysis confirms that the as-implanted helium depth profile does not change under irradiation to 30 dpa at 700 °C. While the helium bubble size distribution becomes narrower with increasing dose, the average size of bubbles remains unchanged and the density of bubbles increases somewhat with dose. Thesemore » results are consistent with a long helium bubble incubation process under continued irradiation at 700 °C up to 30 dpa, similar to that reported under dual and triple beam irradiation at much higher temperatures. The formation of bubbles at this low temperature is enhanced by the nano-layered stacking fault structure in the NE SiC, which enhances point defect mobility parallel to the stacking faults. Here, this stacking fault structure is stable at 700 °C up to 30 dpa and suppresses the formation of dislocation loops normally observed under these irradiation conditions.« less

  1. On charged impurity structures in liquid helium

    NASA Astrophysics Data System (ADS)

    Pelmenev, A. A.; Krushinskaya, I. N.; Bykhalo, I. B.; Boltnev, R. E.

    2016-03-01

    The thermoluminescence spectra of impurity-helium condensates (IHC) submerged in superfluid helium have been observed for the first time. Thermoluminescence of impurity-helium condensates submerged in superfluid helium is explained by neutralization reactions occurring in impurity nanoclusters. Optical spectra of excited products of neutralization reactions between nitrogen cations and thermoactivated electrons were rather different from the spectra observed at higher temperatures, when the luminescence due to nitrogen atom recombination dominates. New results on current detection during the IHC destruction are presented. Two different mechanisms of nanocluster charging are proposed to describe the phenomena observed during preparation and warm-up of IHC samples in bulk superfluid helium, and destruction of IHC samples out of liquid helium.

  2. Test of a cryogenic helium pump

    SciTech Connect

    Lue, J.W.; Miller, J.R.; Walstrom, P.L.; Herz, W.

    1981-01-01

    The design of a cryogenic helium pump for circulating liquid helium in a magnet and the design of a test loop for measuring the pump performance in terms of mass flow vs pump head at various pump speeds are described. A commercial cryogenic helium pump was tested successfully. Despite flaws in the demountable connections, the piston pump itself has performed satisfactorily. A helium pump of this type is suitable for the use of flowing supercritical helium through Internally Cooled Superconductor (ICS) magnets. It has pumped supercritical helium up to 7.5 atm with a pump head up to 2.8 atm. The maximum mass flow rate obtained was about 16 g/s. Performance of the pump was degraded at lower pumping speeds. (LCL)

  3. Test of a cryogenic helium pump

    NASA Astrophysics Data System (ADS)

    Lue, J. W.; Miller, J. R.; Walstrom, P. L.; Herz, W.

    1981-02-01

    The design of a cryogenic helium pump for circulating liquid helium in a magnet and the design of a test loop for measuring the pump performance in terms of mass flow vs pump head at various pump speeds are described. A commercial cryogenic helium pump was tested successfully. Despite flaws in the demountable connections, the piston pump itself has performed satisfactorily. A helium pump of this type is suitable for the use of flowing supercritical helium through internally cooled superconductor magnets. It has pumped supercritical helium up to 7.5 atm with a pump head up to 2.8 atm. The maximum mass flow rate obtained was about 16 g/s. Performance of the pump was degraded at lower pumping speeds.

  4. Thermodynamic properties of hydrogen-helium plasmas.

    NASA Technical Reports Server (NTRS)

    Nelson, H. F.

    1972-01-01

    Calculation of the thermodynamic properties of an atomic hydrogen-helium plasma for postulated conditions present in a stagnation shock layer of a spacecraft entering the atmosphere of Jupiter. These properties can be used to evaluate transport properties, to calculate convective heating, and to investigate nonequilibrium behavior. The calculations have been made for temperatures from 10,000 to 100,000 K, densities of 10 to the minus 7th and .00001 g cu cm, and three plasma compositions: pure hydrogen, 50% hydrogen/50% helium, and pure helium. The shock layer plasma consists of electrons, protons, atomic hydrogen, atomic helium, singly ionized helium, and doubly atomized helium. The thermodynamic properties which have been investigated are: pressure, average molecular weight, internal energy, enthalpy, entropy, specific heat, and isentropic speed of sound. A consistent model was used for the reduction of the ionization potential in the calculation of the partition functions.

  5. 43 CFR 16.2 - Applications for helium disposition agreements.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 43 Public Lands: Interior 1 2012-10-01 2011-10-01 true Applications for helium disposition... HELIUM § 16.2 Applications for helium disposition agreements. The application for a helium disposition... Secretary to determine that the proposal will conserve helium that will otherwise be wasted, drained,...

  6. 43 CFR 16.2 - Applications for helium disposition agreements.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 43 Public Lands: Interior 1 2013-10-01 2013-10-01 false Applications for helium disposition... HELIUM § 16.2 Applications for helium disposition agreements. The application for a helium disposition... Secretary to determine that the proposal will conserve helium that will otherwise be wasted, drained,...

  7. 43 CFR 16.2 - Applications for helium disposition agreements.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 43 Public Lands: Interior 1 2014-10-01 2014-10-01 false Applications for helium disposition... HELIUM § 16.2 Applications for helium disposition agreements. The application for a helium disposition... Secretary to determine that the proposal will conserve helium that will otherwise be wasted, drained,...

  8. 43 CFR 16.2 - Applications for helium disposition agreements.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 43 Public Lands: Interior 1 2011-10-01 2011-10-01 false Applications for helium disposition... HELIUM § 16.2 Applications for helium disposition agreements. The application for a helium disposition... Secretary to determine that the proposal will conserve helium that will otherwise be wasted, drained,...

  9. 43 CFR 16.2 - Applications for helium disposition agreements.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... 43 Public Lands: Interior 1 2010-10-01 2010-10-01 false Applications for helium disposition... HELIUM § 16.2 Applications for helium disposition agreements. The application for a helium disposition... Secretary to determine that the proposal will conserve helium that will otherwise be wasted, drained,...

  10. Energy, helium, and the future: II

    SciTech Connect

    Krupka, M.C.; Hammel, E.F.

    1980-01-01

    The importance of helium as a critical resource material has been recognized specifically by the scientific community and more generally by the 1960 Congressional mandate to institute a long-range conservation program. A major study mandated by the Energy Reorganization Act of 1974 resulted in the publication in 1975 of the document, The Energy-Related Applications of Helium, ERDA-13. This document contained a comprehensive review and analysis relating to helium resources and present and future supply/demand relationships with particular emphasis upon those helium-dependent energy-related technologies projected to be implemented in the post-2000 year time period, e.g., fusion. An updated overview of the helium situation as it exists today is presented. Since publication of ERDA-13, important changes in the data base underlying that document have occurred. The data have since been reexamined, revised, and new information included. Potential supplies of helium from both conventional and unconventional natural gas resources, projected supply/demand relationships to the year 2030 based upon a given power-generation scenario, projected helium demand for specific energy-related technologies, and the supply options (national and international) available to meet that demand are discussed. An updated review will be given of the energy requirements for the extraction of helium from natural gas as they relate to the concentration of helium. A discussion is given concerning the technical and economic feasibility of several methods available both now and conceptually possible, to extract helium from helium-lean natural gas, the atmosphere, and outer space. Finally, a brief review is given of the 1980 Congressional activities with respect to the introduction and possible passage of new helium conservation legislation.

  11. Helium isotopic abundance variation in nature

    SciTech Connect

    Holden, N.E.

    1993-08-01

    The isotopic abundance of helium in nature has been reviewed. This atomic weight value is based on the value of helium in the atmosphere, which is invariant around the world and up to a distance of 100,000 feet. Helium does vary in natural gas, volcanic rocks and gases, ocean floor sediments, waters of various types and in radioactive minerals and ores due to {alpha} particle decay of radioactive nuclides.

  12. Helium in the topside Venus ionosphere

    NASA Technical Reports Server (NTRS)

    Herman, J. R.

    1972-01-01

    The quantity of helium in the Venus atmosphere is estimated from an examination of the measured ionization profiles. The amount of helium necessary to give agreement between the computed and experimental results is approximately 4 x 10 to the 8th power/cucm at 140 km. When an eddy diffusion coefficient of 1,000,000 sq cm/see is used, the atmospheric helium mixing ratio is found to be 0.0006; a value nearly ten times that for earth.

  13. Radioactive transitions in the helium isoelectronic sequence

    NASA Technical Reports Server (NTRS)

    Dalgarno, A.

    1971-01-01

    The principles of the atomic spectrum theory are used to quantitatively analyze radiation transitions in two-electron helium-like atomic systems. Quantum theoretical methods, describing absorption and emission of a single photon in a radiative transition between two stationary states of an atomic system, reproduced the energy level diagram for the low lying states of helium. Reliable values are obtained from accurate variationally determined two-electron nonrelativistic wave functions for radiative transition probabilities of 2 3p states in the helium isoelectric sequence, and for the 2 1s and 2 3s1 states of the helium sequence.

  14. Helium-3 emission related to volcanic activity

    SciTech Connect

    Sano, Y.; Nakamura, Y.; Wakita, H.; Urabe, A.; Tominaga, T.

    1984-04-13

    The helium-3/helium-4 ratio in bubbling gases from ten hot springs located around Mount Ontake, an active volcano in central Japan, ranges from 1.71 R/sub atm/ (1.71 times the atmospheric ratio of 1.40 x 10/sup -6/) to 6.15 R/sub atm/. The value of the ratio decreases with distance from the central cone of the volcano. Such a tendency may be a characteristic of helium-3 emission in volcanic areas and suggests more primitive helium-3 is carried with fluid flowing through a conduit during volcanic activity. 6 references, 1 figure, 1 table.

  15. Swelling or erosion on the surface of patterned GaN damaged by heavy ion implantation

    SciTech Connect

    Gao, Yuan; Lan, Chune; Xue, Jianming; Yan, Sha; Wang, Yugang; Xu, Fujun; Shen, Bo; Zhang, Yanwen

    2010-06-08

    Wurtzite undoped GaN epilayers (0 0 0 1) was implanted with 500 keV Au+ ions at room temperature under different doses, respectively. Ion implantation was performed through photoresist masks on GaN to produce alternating strips. The experimental results showed that the step height of swelling and decomposition in implanted GaN depended on ion dose and annealing temperature, i.e., damage level and its evolution. This damage evolution is contributed to implantation-induced defect production, and defect migration/accumulation occurred at different levels of displacement per atom. The results suggest that the swelling is due to the formation of porous structures in the amorphous region of implanted GaN. The decomposition of implanted area can be attributed to the disorder saturation and the diffusion of surface amorphous layer.

  16. Helium and neon abundances and compositions in cometary matter.

    PubMed

    Marty, Bernard; Palma, Russell L; Pepin, Robert O; Zimmermann, Laurent; Schlutter, Dennis J; Burnard, Peter G; Westphal, Andrew J; Snead, Christopher J; Bajt, Sasa; Becker, Richard H; Simones, Jacob E

    2008-01-01

    Materials trapped and preserved in comets date from the earliest history of the solar system. Particles captured by the Stardust spacecraft from comet 81P/Wild 2 are indisputable cometary matter available for laboratory study. Here we report measurements of noble gases in Stardust material. Neon isotope ratios are within the range observed in "phase Q," a ubiquitous, primitive organic carrier of noble gases in meteorites. Helium displays 3He/4He ratios twice those in phase Q and in Jupiter's atmosphere. Abundances per gram are surprisingly large, suggesting implantation by ion irradiation. The gases are probably carried in high-temperature igneous grains similar to particles found in other Stardust studies. Collectively, the evidence points to gas acquisition in a hot, high ion-flux nebular environment close to the young Sun. PMID:18174437

  17. Recent advances in prepellicle mask cleaning

    NASA Astrophysics Data System (ADS)

    Plambeck, Bert F.; Cerio, Mark D.; Reynolds, James A.

    1990-06-01

    Cleaning of photomasks prior to pelliclizatlon Is the most demanding of all mask cleaning operations. A single particle found under a pellicle can lead to costly and time consuming repelliclization. Improved stepper resolution and automatic post pellicle inspection systems are making the requirement even more difficult to meet. Careful anal ysi s of parti culate sou rces an d clean i n g p rocesses b y Solid State Equipment Corporation have lead to the evolution of the SSEC Model 156SC which has proven to be effective as a sub micron prepellicle mask cleaner. It uses a combination of brush surfactant high pressure water static control fluid and rapid drying to achieve superior cleaning results. In an effort to meet their cleaning requirements In a cost effective manner DuPont Photomasks has installed this system in their San Jose Facility. The system design and the evaluation techniques are described. Some experimental data is presented.

  18. Informational masking of speech in dyslexic children.

    PubMed

    Calcus, Axelle; Colin, Cécile; Deltenre, Paul; Kolinsky, Régine

    2015-06-01

    Studies evaluating speech perception in noise have reported inconsistent results regarding a potential deficit in dyslexic children. So far, most of them investigated energetic masking. The present study evaluated situations inducing mostly informational masking, which reflects cognitive interference induced by the masker. Dyslexic children were asked to identify a female target syllable presented in quiet, babble, unmodulated, and modulated speech-shaped noise. Whereas their performance was comparable to normal-reading children in quiet, it dropped significantly in all noisy conditions compared to age-, but not reading level-matched controls. Interestingly, noise affected similarly the reception of voicing, place, and manner of articulation in dyslexic and normal-reading children. PMID:26093461

  19. Phase measurements of EUV mask defects

    DOE PAGESBeta

    Claus, Rene A.; Wang, Yow-Gwo; Wojdyla, Antoine; Benk, Markus P.; Goldberg, Kenneth A.; Neureuther, Andrew R.; Naulleau, Patrick P.; Waller, Laura

    2015-02-22

    Extreme Ultraviolet (EUV) Lithography mask defects were examined on the actinic mask imaging system, SHARP, at Lawrence Berkeley National Laboratory. Also, a quantitative phase retrieval algorithm based on the Weak Object Transfer Function was applied to the measured through-focus aerial images to examine the amplitude and phase of the defects. The accuracy of the algorithm was demonstrated by comparing the results of measurements using a phase contrast zone plate and a standard zone plate. Using partially coherent illumination to measure frequencies that would otherwise fall outside the numerical aperture (NA), it was shown that some defects are smaller than themore » conventional resolution of the microscope. We found that the programmed defects of various sizes were measured and shown to have both an amplitude and a phase component that the algorithm is able to recover.« less

  20. Phase measurements of EUV mask defects

    SciTech Connect

    Claus, Rene A.; Wang, Yow-Gwo; Wojdyla, Antoine; Benk, Markus P.; Goldberg, Kenneth A.; Neureuther, Andrew R.; Naulleau, Patrick P.; Waller, Laura

    2015-02-22

    Extreme Ultraviolet (EUV) Lithography mask defects were examined on the actinic mask imaging system, SHARP, at Lawrence Berkeley National Laboratory. Also, a quantitative phase retrieval algorithm based on the Weak Object Transfer Function was applied to the measured through-focus aerial images to examine the amplitude and phase of the defects. The accuracy of the algorithm was demonstrated by comparing the results of measurements using a phase contrast zone plate and a standard zone plate. Using partially coherent illumination to measure frequencies that would otherwise fall outside the numerical aperture (NA), it was shown that some defects are smaller than the conventional resolution of the microscope. We found that the programmed defects of various sizes were measured and shown to have both an amplitude and a phase component that the algorithm is able to recover.

  1. EUVL mask inspection at Hydrogen Lyman Alpha

    NASA Astrophysics Data System (ADS)

    Jota, Thiago S.; Milster, Tom D.

    2012-11-01

    Mask inspection is an outstanding challenge for Extreme Ultra-Violet Lithography (EUVL). The purpose of this investigation is to compare imaging characteristics of ArF and KrF inspection sources to imaging characteristics using a source at the Lyman-alpha line of Hydrogen at 121.6nm (HLA). HLA provides a raw resolution improvement of 37% to ArF and 51% to KrF, based on proportional wavelength scaling. The HLA wavelength is in an atmospheric transmission window, so a vacuum environment is not required. Our comparison uses rigorous vector imaging techniques to simulate partially coherent illumination schemes and reasonably accurate mask material properties and dimensions. Contrast is evaluated for representative spatial frequencies. Imaging and detection of defects are also considered with NILS and MEEF. The goal is high throughput inspection with maximum resolution, contrast, and sensitivity.

  2. 43 CFR 3195.20 - Who must purchase major helium requirements from Federal helium suppliers?

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 43 Public Lands: Interior 2 2013-10-01 2013-10-01 false Who must purchase major helium requirements from Federal helium suppliers? 3195.20 Section 3195.20 Public Lands: Interior Regulations Relating... (3000) HELIUM CONTRACTS Federal Agency Requirements § 3195.20 Who must purchase major...

  3. 43 CFR 3195.20 - Who must purchase major helium requirements from Federal helium suppliers?

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 43 Public Lands: Interior 2 2012-10-01 2012-10-01 false Who must purchase major helium requirements from Federal helium suppliers? 3195.20 Section 3195.20 Public Lands: Interior Regulations Relating... (3000) HELIUM CONTRACTS Federal Agency Requirements § 3195.20 Who must purchase major...

  4. 43 CFR 3195.20 - Who must purchase major helium requirements from Federal helium suppliers?

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 43 Public Lands: Interior 2 2014-10-01 2014-10-01 false Who must purchase major helium requirements from Federal helium suppliers? 3195.20 Section 3195.20 Public Lands: Interior Regulations Relating... (3000) HELIUM CONTRACTS Federal Agency Requirements § 3195.20 Who must purchase major...

  5. 43 CFR 3195.20 - Who must purchase major helium requirements from Federal helium suppliers?

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 43 Public Lands: Interior 2 2011-10-01 2011-10-01 false Who must purchase major helium requirements from Federal helium suppliers? 3195.20 Section 3195.20 Public Lands: Interior Regulations Relating... (3000) HELIUM CONTRACTS Federal Agency Requirements § 3195.20 Who must purchase major...

  6. Site specific isolated nanostructure array formation on a large area by broad ion beam without any mask and resist

    NASA Astrophysics Data System (ADS)

    Karmakar, Prasanta; Satpati, Biswarup

    2014-06-01

    We report the formation of isolated nanostructure arrays on a large area via broad ion beam implantation without the aid of any mask or resist. Desired ions have been implanted at specific locations of the prefabricated silicon ripple or triangular structures by exploiting the variation of local ion impact angles. We have shown that the implantation of Fe ions on an O+ ions induced pre fabricated triangular shaped patterned Si surface results in a self-organized periodic array of striped magnetic nanostructures having several micron length and about 50 nm width arranged with a spacial separation of ˜200 nm. The morphology, composition, crystalline structure, and magnetic property of these nanopatterns have been analyzed using high-resolution cross-sectional transmission electron microscopy and atomic force microscopy. A geometrical model has been proposed to explain the fundamental features of such ion-induced nanopattern structures.

  7. 43 CFR 3195.35 - What happens if I have an outstanding obligation to purchase refined helium under a Helium...

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... obligation to purchase refined helium under a Helium Distribution Contract? 3195.35 Section 3195.35 Public... OF THE INTERIOR MINERALS MANAGEMENT (3000) HELIUM CONTRACTS Federal Helium Supplier Requirements § 3195.35 What happens if I have an outstanding obligation to purchase refined helium under a...

  8. 43 CFR 3195.35 - What happens if I have an outstanding obligation to purchase refined helium under a Helium...

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... obligation to purchase refined helium under a Helium Distribution Contract? 3195.35 Section 3195.35 Public... OF THE INTERIOR MINERALS MANAGEMENT (3000) HELIUM CONTRACTS Federal Helium Supplier Requirements § 3195.35 What happens if I have an outstanding obligation to purchase refined helium under a...

  9. 43 CFR 3195.35 - What happens if I have an outstanding obligation to purchase refined helium under a Helium...

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... obligation to purchase refined helium under a Helium Distribution Contract? 3195.35 Section 3195.35 Public... OF THE INTERIOR MINERALS MANAGEMENT (3000) HELIUM CONTRACTS Federal Helium Supplier Requirements § 3195.35 What happens if I have an outstanding obligation to purchase refined helium under a...

  10. 43 CFR 3195.35 - What happens if I have an outstanding obligation to purchase refined helium under a Helium...

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... obligation to purchase refined helium under a Helium Distribution Contract? 3195.35 Section 3195.35 Public... OF THE INTERIOR MINERALS MANAGEMENT (3000) HELIUM CONTRACTS Federal Helium Supplier Requirements § 3195.35 What happens if I have an outstanding obligation to purchase refined helium under a...

  11. Numerically designed phase-mask for stellar coronagraph

    NASA Astrophysics Data System (ADS)

    Baba, Naoshi; Murakami, Naoshi; Miura, Noriaki; Tamura, Motohide

    2015-09-01

    Phase-mask coronagraph holds the ability to detect exoplanets very close to their parent star. We report a new kind of phase mask that performs the contrast ratio of more than the tenth power of 10 for a circular aperture with shades of a secondary mirror and spiders. The phase distribution of the phase mask is numerically obtained by making the leaked light distribute outside the transparent part of the pupil. We applied the hybrid input-output algorithm, one of phase retrieval methods, to find the phase distribution of the phase mask. We show the characteristics of thus obtained phase mask.

  12. High speed mask inspection data prep flow based on pipelining

    NASA Astrophysics Data System (ADS)

    Hung, Dan; Morales, Domingo; Canepa, Juan Pablo; Kim, Stephen; Liu, Po; Sier, Jean-Paul; LoPresti, Patrick

    2011-11-01

    Mask manufacturers are continuously challenged as a result of the explosive growth in mask pattern data volume. This paper presents a new pipelined approach to mask data preparation for inspection that significantly reduces the data preparation times compared to the conventional flows used today. The focus of this approach minimizes I/O bottlenecks and allows for higher throughput on computer clusters. This solution is optimized for the industry standard OASIS.MASK format. These enhancements in the data processing flow, along with optimizations in the data preparation system architecture, offer a more efficient and highly scalable solution for mask inspection data preparation.

  13. Multiplexing of encrypted data using fractal masks.

    PubMed

    Barrera, John F; Tebaldi, Myrian; Amaya, Dafne; Furlan, Walter D; Monsoriu, Juan A; Bolognini, Néstor; Torroba, Roberto

    2012-07-15

    In this Letter, we present to the best of our knowledge a new all-optical technique for multiple-image encryption and multiplexing, based on fractal encrypting masks. The optical architecture is a joint transform correlator. The multiplexed encrypted data are stored in a photorefractive crystal. The fractal parameters of the key can be easily tuned to lead to a multiplexing operation without cross talk effects. Experimental results that support the potential of the method are presented. PMID:22825170

  14. Extreme Ultraviolet Lithography - Reflective Mask Technology

    SciTech Connect

    Walton, C.C.; Kearney, P.A.; Mirkarimi, P.B.; Bowers, J.M.; Cerjan, C.; Warrick, A.L.; Wilhelmsen, K.; Fought, E.; Moore, C.; Larson, C.; Baker, S.; Burkhart, S.C.; Hector, S.D.

    2000-05-09

    EUVL mask blanks consist of a distributed Bragg reflector made of 6.7nm-pitch bi-layers of MO and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental- and handling-added defect levels. Originally designed to coat 150mm substrates, it was upgraded in July, 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects >100nm below 0.05/cm{sup 2}. These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed. Success in defect reduction is highly dependent upon defect detection, characterization, and cross-platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects. The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work. We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank

  15. Mask Analysis Program (MAP) reference manual

    NASA Technical Reports Server (NTRS)

    Mitchell, C. L.

    1976-01-01

    A document intended to serve as a User's Manual and a Programmer's Manual for the Mask Analysis Program is presented. The first portion of the document is devoted to the user. It contains all of the information required to execute MAP. The remainder of the document describes the details of MAP software logic. Although the information in this portion is not required to run the program, it is recommended that every user review it to gain an appreciation for the program functions.

  16. The EOS CERES Global Cloud Mask

    NASA Technical Reports Server (NTRS)

    Berendes, T. A.; Welch, R. M.; Trepte, Q.; Schaaf, C.; Baum, B. A.

    1996-01-01

    To detect long-term climate trends, it is essential to produce long-term and consistent data sets from a variety of different satellite platforms. With current global cloud climatology data sets, such as the International Satellite Cloud Climatology Experiment (ISCCP) or CLAVR (Clouds from Advanced Very High Resolution Radiometer), one of the first processing steps is to determine whether an imager pixel is obstructed between the satellite and the surface, i.e., determine a cloud 'mask.' A cloud mask is essential to studies monitoring changes over ocean, land, or snow-covered surfaces. As part of the Earth Observing System (EOS) program, a series of platforms will be flown beginning in 1997 with the Tropical Rainfall Measurement Mission (TRMM) and subsequently the EOS-AM and EOS-PM platforms in following years. The cloud imager on TRMM is the Visible/Infrared Sensor (VIRS), while the Moderate Resolution Imaging Spectroradiometer (MODIS) is the imager on the EOS platforms. To be useful for long term studies, a cloud masking algorithm should produce consistent results between existing (AVHRR) data, and future VIRS and MODIS data. The present work outlines both existing and proposed approaches to detecting cloud using multispectral narrowband radiance data. Clouds generally are characterized by higher albedos and lower temperatures than the underlying surface. However, there are numerous conditions when this characterization is inappropriate, most notably over snow and ice of the cloud types, cirrus, stratocumulus and cumulus are the most difficult to detect. Other problems arise when analyzing data from sun-glint areas over oceans or lakes over deserts or over regions containing numerous fires and smoke. The cloud mask effort builds upon operational experience of several groups that will now be discussed.

  17. Nanovoid Formation and Dynamics in He+-Implanted Nanocrystalline Silicon

    NASA Astrophysics Data System (ADS)

    Lorenzi, Bruno; Frabboni, Stefano; Gazzadi, Gian Carlo; Tonini, Rita; Ottaviani, Giampiero; Narducci, Dario

    2014-10-01

    Helium implantation in single crystal silicon is known to lead, after a proper thermal treatment, to the formation of voids with diameters ranging between 10 nm and 30 nm. Formation of voids is governed by the coalescence of vacancies created by implantation, initially trapping helium atoms. At high temperatures (), helium leaves the nanobubbles and outdiffuses, while the now empty voids grow in size and eventually change their shape to form tetrakaidecahedra (Wulff construction). In this communication, we report how He+ implantation in heavily boron-doped nanocrystalline silicon shows a completely different dynamics. Annealing at leads to the formation of large voids, located around grain boundaries, along with a large number of nanovoids with an average diameter of 2-4 nm and an estimated density of distributed throughout the grains. Annealing at higher temperature (up to ) also induces a decrease of the void size with a change in their density, finally accounting to . The high temperature annealing also causes vacancy evaporation down to a depth of 80-100 nm from the outer surface. The possibility of obtaining a stable, uniform distribution of nanometer-sized voids is of major relevance as a novel tool for phonon and electron engineering in thermoelectric materials.

  18. Mask-to-wafer alignment system

    DOEpatents

    Sweatt, William C.; Tichenor, Daniel A.; Haney, Steven J.

    2003-11-04

    A modified beam splitter that has a hole pattern that is symmetric in one axis and anti-symmetric in the other can be employed in a mask-to-wafer alignment device. The device is particularly suited for rough alignment using visible light. The modified beam splitter transmits and reflects light from a source of electromagnetic radiation and it includes a substrate that has a first surface facing the source of electromagnetic radiation and second surface that is reflective of said electromagnetic radiation. The substrate defines a hole pattern about a central line of the substrate. In operation, an input beam from a camera is directed toward the modified beam splitter and the light from the camera that passes through the holes illuminates the reticle on the wafer. The light beam from the camera also projects an image of a corresponding reticle pattern that is formed on the mask surface of the that is positioned downstream from the camera. Alignment can be accomplished by detecting the radiation that is reflected from the second surface of the modified beam splitter since the reflected radiation contains both the image of the pattern from the mask and a corresponding pattern on the wafer.

  19. Dose masking feature for BNCT radiotherapy planning

    DOEpatents

    Cook, Jeremy L.; Wessol, Daniel E.; Wheeler, Floyd J.

    2000-01-01

    A system for displaying an accurate model of isodoses to be used in radiotherapy so that appropriate planning can be performed prior to actual treatment on a patient. The nature of the simulation of the radiotherapy planning for BNCT and Fast Neutron Therapy, etc., requires that the doses be computed in the entire volume. The "entire volume" includes the patient and beam geometries as well as the air spaces in between. Isodoses derived from the computed doses will therefore extend into the air regions between the patient and beam geometries and thus depict the unrealistic possibility that radiation deposition occurs in regions containing no physical media. This problem is solved by computing the doses for the entire geometry and then masking the physical and air regions along with the isodose contours superimposed over the patient image at the corresponding plane. The user is thus able to mask out (remove) the contour lines from the unwanted areas of the image by selecting the appropriate contour masking region from the raster image.

  20. Helium bubble bursting in tungsten

    SciTech Connect

    Sefta, Faiza; Juslin, Niklas; Wirth, Brian D.

    2013-12-28

    Molecular dynamics simulations have been used to systematically study the pressure evolution and bursting behavior of sub-surface helium bubbles and the resulting tungsten surface morphology. This study specifically investigates how bubble shape and size, temperature, tungsten surface orientation, and ligament thickness above the bubble influence bubble stability and surface evolution. The tungsten surface is roughened by a combination of adatom “islands,” craters, and pinholes. The present study provides insight into the mechanisms and conditions leading to various tungsten topology changes, which we believe are the initial stages of surface evolution leading to the formation of nanoscale fuzz.