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Sample records for mo-si mo-ge w-si

  1. EXAFS Studies of Amorphous MoGe

    NASA Astrophysics Data System (ADS)

    Boyce, J. B.; Carter, W. L.; Geballe, T. H.; Claeson, T.

    1982-06-01

    Extended X-ray Absorption Fine Structure of amorphous and crystalline Mo-Ge samples sputter deposited on glass or kapton substrates was studied. Small local distortions were found in a substitutional b.c.c. Mo rich sample. A coordination in the range 5-7 and Ge-Mo distance of 2.65 A were estimated for an amorphous, intermediate composition Mo-Ge sample. The lack of superconductivity of some samples deposited on kapton was correlated to the presence of oxygen in the material.

  2. MoSi2-Base Composites

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G.

    2003-01-01

    Addition of 30 to 50 vol% of Si3N4 particulate to MoSi2 eliminated its low temperature catastrophic failure, improved room temperature fracture toughness and the creep resistance. The hybrid composite SCS-6/MoSi2-Si3N4 did not show any matrix cracking and exhibited excellent mechanical and environmental properties. Hi-Nicalon continuous fiber reinforced MoSi2-Si3N4 also showed good strength and toughness. A new MoSi2-base composite containing in-situ whisker-type (Beta)Si3N4 grains in a MoSi2 matrix is also described.

  3. Mo-Si alloy development

    SciTech Connect

    Liu, C.T.; Heatherly, L.; Wright, J.L.

    1996-06-01

    The objective of this task is to develop new-generation corrosion-resistant Mo-Si intermetallic alloys as hot components in advanced fossil energy conversion and combustion systems. The initial effort is devoted to Mo{sub 5}-Si{sub 3}-base (MSB) alloys containing boron additions. Three MSB alloys based on Mo-10.5Si-1.1B (wt %), weighing 1500 g were prepared by hot pressing of elemental and alloy powders at temperatures to 1600{degrees}C in vacuum. Microporosities and glassy-phase (probably silicate phases) formations are identified as the major concerns for preparation of MSB alloys by powder metallurgy. Suggestions are made to alleviate the problems of material processing.

  4. Mo/Si and MoSi2/Si nanostructures for multilayer Laue lens

    NASA Astrophysics Data System (ADS)

    Takenaka, H.; Ichimaru, S.; Ohchi, T.; Koyama, T.; Tsuji, T.; Takano, H.; Kagoshima, Y.

    2009-09-01

    To develop a multilayer Laue lens (MLL), we fabricated depth-graded Mo/Si and MoSi2/Si multilayers with each boundary according to the Fresnel zone configuration. The multilayers were deposited by magnetron sputtering. From the result of SEM image analysis of the multilayer cross sections, MoSi2/Si multilayer had smaller layer-thickness errors than Mo/Si multilayer. In addition, from the result of the focusing test by using 20-keV X-rays, the measured beam size of MoSi2/Si MLL had a small blurring from the diffraction limited beam size. These results suggest that MoSi2/Si multilayer is better suited than Mo/Si multilayer for use as an MLL in hard x-ray nanofocusing.

  5. Vortices in superconducting MoGe pentagon

    NASA Astrophysics Data System (ADS)

    Ishida, Takekazu; Thanh Huy, Ho; Kato, Masaru; Hayashhi, Masahiko

    2013-03-01

    Vortices in bulk prefer to form a triangular lattice while a mesoscopic superconductor with a size comparable to coherence length ξ or the magnetic penetration depth λ is quite different so as to create particular configuration of vortices. The behavior of such structures in an external magnetic field is strongly influenced by the boundary conditions. Vortex states in superconducting disk, triangle and square pattern have been extensively studied both theoretically and experimentally [B. J. Baelus et al., Phys. Rev. B 69, 064506 (2004)]. We present vortex structures in MoGe pentagon disks imaged by means of a scanning quantum interference device (SQUID) microscopy [Ho Thanh Huy et al., Physica C, in press; DOI 10.1016/j.physc.2012.03.037.] Systematic measurements allow us to reveal how vortex arrangement evolves with the applied magnetic field. Moreover, we found that shell filling rule is subjected to change when a pinning center is introduced. Numerical calculations of vortex structure in pentagon disks on the basis of the nonlinear Ginzburg-Landau theory reveal that there are good agreement between experimental data and theoretical calculations.

  6. Mo-Si-B Alloy Development

    SciTech Connect

    Schneibel, Joachim H; Brady, Michael P; Meyer III, Harry M; Horton Jr, Joe A; Kruzic, JJ; Ritchie, R O

    2005-01-01

    Mo-Si-B silicides consisting of the phases {alpha}-Mo (Mo solid solution), Mo{sub 3}Si, and Mo{sub 5}SiB{sub 2} have melting points on the order of 2000 C and have potential as ultra-high temperature structural materials. Mo-Si-B alloys can be processed such that the {alpha}-Mo is present in the form of isolated particles in a silicide matrix, or as a continuous matrix 'cementing' individual silicide particles together. The latter microstructure is similar to that of WC-Co hard metals. This paper focuses on the relationship between the topology as well as scale of the microstructure of Mo-Mo{sub 3}Si-Mo{sub 5}SiB{sub 2} alloys, and their creep strength and fracture toughness. For example, the creep strength of Mo-Si-B alloys is improved by reducing the {alpha}-Mo volume fraction and by making the {alpha}-Mo phase discontinuous. The fracture toughness is improved by increasing the {alpha}-Mo volume fraction and by making the {alpha}-Mo phase continuous. Room temperature stress intensity factors as high as 21 MPa m{sup 1/2} were obtained. The room temperature fracture toughness of Mo-Si-B alloys can also be improved by microalloying with Zr. The room temperature ductility of Mo itself can be improved by adding MgAl{sub 2}O{sub 4} spinel particles suggesting yet another way to improve the ductile phase toughening of Mo-Si-B alloys.

  7. Mo-Si-B Alloy Development

    SciTech Connect

    Schneibel, J.H.; Kruzie, J.J.; Ritchie, R.O.

    2003-04-24

    Mo-Si-B silicides consisting of the phases {alpha}-Mo (Mo solid solution), Mo{sub 3}Si, and Mo{sub 5}SiB{sub 2} have melting points on the order of 2000 C and have potential as ultra-high temperature structural materials. Mo-Si-B alloys can be processed such that the {alpha}-Mo is present in the form of isolated particles in a silicide matrix, or as a continuous matrix ''cementing'' individual silicide particles together. The latter microstructure is similar to that of WC-Co hard metals. This paper focuses on the relationship between the topology as well as scale of the microstructure of Mo-Mo{sub 3}Si-Mo{sub 5}SiB{sub 2} alloys, and their creep strength and fracture toughness. For example, the creep strength of Mo-Si-B alloys is improved by reducing the {alpha}-Mo volume fraction and by making the {alpha}-Mo phase discontinuous. The fracture toughness is improved by increasing the {alpha}-Mo volume fraction and by making the {alpha}-Mo phase continuous. Room temperature stress intensity factors as high as 21 MPa m{sup 1/2} were obtained. The room temperature fracture toughness of Mo-Si-B alloys can also be improved by microalloying with Zr. The room temperature ductility of Mo itself can be improved by adding MgAl{sub 2}O{sub 4} spinel particles suggesting yet another way to improve the ductile phase toughening of Mo-Si-B alloys.

  8. A perspective on MoSi sub 2 based composites

    SciTech Connect

    Petrovic, J.J. ); Vasudevan, A.K. )

    1992-01-01

    MoSi{sub 2} based composites represent an important new class of high temperature structural silicides,'' with significant potential for elevated temperature structural applications in the range of 1200--1600{degrees}C in oxidizing and aggressive environments. The properties of MoSi{sub 2} which make it an attractive matrix for high temperature composites are described and the development history of these materials traced. Latest results on elevated temperature creep resistance, low temperature fracture toughness, and composite oxidation behavior are summarized. Important avenues for future MoSi{sub 2} based composite development are suggested.

  9. Superconductor-Insulator Transition in Long MoGe Nanowires

    NASA Astrophysics Data System (ADS)

    Kim, Hyunjeong; Jamali, Shirin; Rogachev, A.

    2012-07-01

    The properties of one-dimensional superconducting wires depend on physical processes with different characteristic lengths. To identify the process dominant in the critical regime we have studied the transport properties of very narrow (9-20 nm) MoGe wires fabricated by advanced electron-beam lithography in a wide range of lengths, 1-25μm. We observed that the wires undergo a superconductor-insulator transition (SIT) that is controlled by cross sectional area of a wire and possibly also by the width-to-thickness ratio. The mean-field critical temperature decreases exponentially with the inverse of the wire cross section. We observed that a qualitatively similar superconductor-insulator transition can be induced by an external magnetic field. Our results are not consistent with any currently known theory of the SIT. Some long superconducting MoGe nanowires can be identified as localized superconductors; namely, in these wires the one-electron localization length is much smaller than the length of a wire.

  10. Adsorption of oxygen atom on MoSi2 (110) surface

    NASA Astrophysics Data System (ADS)

    Sun, S. P.; Li, X. P.; Wang, H. J.; Jiang, Y.; Yi, D. Q.

    2016-09-01

    The adsorption energy, structural relaxation and electronic properties of oxygen atom on MoSi2 (110) surface have been investigated by first-principles calculations. The energetic stability of MoSi2 low-index surfaces was analyzed, and the results suggested that MoSi2 (110) surface had energetically stability. The site of oxygen atom adsorbed on MoSi2 (110) surface were discussed, and the results indicated that the preference adsorption site of MoSi2 (110) surface for oxygen atom was H site (hollow position). Our calculated work should help to understand further the interaction between oxygen atoms and MoSi2 surfaces.

  11. Mo-Si-B-Based Coatings for Ceramic Base Substrates

    NASA Technical Reports Server (NTRS)

    Perepezko, John Harry (Inventor); Sakidja, Ridwan (Inventor); Ritt, Patrick (Inventor)

    2015-01-01

    Alumina-containing coatings based on molybdenum (Mo), silicon (Si), and boron (B) ("MoSiB coatings") that form protective, oxidation-resistant scales on ceramic substrate at high temperatures are provided. The protective scales comprise an aluminoborosilicate glass, and may additionally contain molybdenum. Two-stage deposition methods for forming the coatings are also provided.

  12. Fabrication and testing of plasma-spray formed MoSi{sub 2} and MoSi{sub 2} composite tubes

    SciTech Connect

    Castro, R.G.; Hellman, J.R.; Segall, A.E.; Shelleman, D.L.

    1993-12-31

    Plasma-spray forming has been used to fabricate thick-wall tubes of MoSi{sub 2} and MoSi{sub 2} containing concentric layers of Al{sub 2}O{sub 3}. This process is being investigated as a potential fabrication method for producing tubular components of MoSi{sub 2} and MoSi{sub 2} composites for use in high temperature fuel-burner applications. Results are reported on spray forming method used to produce various tube sizes. Room temperature strength of pure MoSi{sub 2} tubes in the as-deposited condition, and after heat-treating at 1500 C for 2 hours in vacuum is also reported. Strength of plasma sprayed MoSi{sub 2} tubes were measured via diametral compression of O-ring and C-ring sections in air at room temperature. Prediction of the strength distribution was based on Weibull statistical theory.

  13. MoSi2-Base Composite for Engine Applications

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G.; Nathal, Michael V.

    1997-01-01

    The intermetallic compound MoSi2 has long been known as a high temperature material that has excellent oxidation resistance and electrical/thermal conductivity. Also its low cost, high melting point (2023 C), relatively low density (6.2 g/cm versus 8 g/cm for current engine materials), and ease of machining make it an attractive structural material. However, the use of MoSi2 has been hindered because of the brittle nature of the material at low temperatures, inadequate creep resistance at high temperatures, accelerated oxidation (also known as 'pest' oxidation) at temperatures between approximately 400 and 500 C, and a coefficient of thermal expansion (CTE) that is relatively high in comparison to potential reinforcing fibers such as SiC. This CTE mismatch between the fiber and the matrix resulted in severe matrix cracking during thermal cycling.

  14. Anisotropy of heat conduction in Mo/Si multilayers

    SciTech Connect

    Medvedev, V. V.; Yakshin, A. E.; Kruijs, R. W. E. van de; Bijkerk, F.; Yang, J.; Schmidt, A. J.; Zoethout, E.

    2015-08-28

    This paper reports on the studies of anisotropic heat conduction phenomena in Mo/Si multilayers with individual layer thicknesses selected to be smaller than the mean free path of heat carriers. We applied the frequency-domain thermoreflectance technique to characterize the thermal conductivity tensor. While the mechanisms of the cross-plane heat conduction were studied in detail previously, here we focus on the in-plane heat conduction. To analyze the relative contribution of electron transport to the in-plane heat conduction, we applied sheet-resistance measurements. Results of Mo/Si multilayers with variable thickness of the Mo layers indicate that the net in-plane thermal conductivity depends on the microstructure of the Mo layers.

  15. The oxidation resistance of MoSi sub 2 composites

    SciTech Connect

    Lee, E.W.; Khan, A.; Cook, J.; Mahapatra, R.; Waldman, J. )

    1991-03-01

    Molybdenum disilicide (MoSi{sub 2}) is a high-melting-point intermetallic compound most noted for its excellent resistance to high-temperature oxidation. It has found engineering application as high-temperature electric heating elements; for example, MoSi{sub 2} heating elements are commercially available for use at temperatures as high as 1,900{sup {degrees}}C. MoSi{sub 2} has also found some limited application as an oxidation-resistant coating material for molybdenum and molybdenum-base alloys. In order to increase the thrust-to-weight ratio of gas turbine engines, there is a need for structural materials capable of extended operation at temperatures up to 1,600{sup {degrees}}C. Present technology limits engine designers to a maximum materials temperature of approximately 1,100{sup {degrees}}C; this limit is dictated by the state-of-the-art propulsion materials, such as nickel-base superalloys. Future propulsion materials will require a combination of good mechanical properties (e.g., high-temperature strength/creep resistance, fracture toughness, fatigue strength), excellent oxidation resistance, high-temperature stability and low density. In light of these requirements, intermetallics such as nickel and titanium aluminides have been extensively studied and are being developed. These intermetallics melt in the temperature range of 1,400-1,600{sup {degrees}}C, which limits their potential upper use temperature to about 1,200{sup {degrees}}C. This paper highlights the oxidation behavior of MoSi{sub 2}XD composites in conjunction with their microstructural features.

  16. Characterization of ultra smooth interfaces in Mo/Si-multilayers.

    PubMed

    Dietsch, R; Holz, T; Hopfe, S; Mai, H; Scholz, R; Schöneich, B; Wendrock, H

    1995-10-01

    The interface structure of Mo/Si-multilayers prepared by Pulsed Laser Deposition (PLD) on Si substrates at room temperature has been investigated. Already the in-situ ellipsometer data acquired during film growth indicate a particular behaviour of this material system that is caused by reaction/diffusion processes of the condensing atoms. MoSi(x) interlayers are formed both at the Mo on Si- and at the Si on Mo-interfaces. The results of multilayer characterization carried out by SNMS and RBS show similar concentration profiles for both types of the interlayers. More detailed information about interface structure and morphology can be provided by HREM investigations. In the TEM micrographs of various multilayers prepared for different laser light wavelengths an improvement of layer stack quality, i.e. formation of abrupt interfaces, with increasing photon energy is observed. Layer stacks having almost ideally smooth interfaces were synthesized by UV-photon ablation. HREM micrographs of these multilayers show a pronounced separation of spacer and absorber layers. The roughness sigma(R) of the interfaces between the amorphous Si- and MoSi(x)-layers was determined by image analysis. On the average a level sigma(R) approximately 0.1 nm is found. There is no indication for roughness replication or amplification from interface to interface as it is known from the appropriate products of conventional thin film technologies. PMID:15048504

  17. MoSi2-Base Hybrid Composites from Aeroengine Applications

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G.

    2000-01-01

    Addition of about 30 to 50 vol % of Si3N4 particulate to MoSi2 improved low temperature accelerated oxidation resistance by forming a Si2ON2 protective scale and thereby eliminated catastrophic 'pest failure'. The Si3N4 addition also improved the high temperature creep strength by nearly five orders of magnitude, doubled the room temperature toughness, and significantly lowered the CTE of the MoSi2 which eliminated matrix cracking in SCS-6 reinforced composites even after thermal cycling. The SCS-6 fiber reinforcement improved the room temperature fracture toughness by seven times and impact resistance by five times. The composite exhibited this excellent strength and toughness improvement up to 1673 K. More recently, tape casting was adopted as the preferred processing of MoSi2-base composites due to improved fiber spacing, ability to use small diameter fibers, and for lower cost. Good strength and toughness values were also obtained with fine diameter Hi-Nicalon tow fibers. These hybrid composites remain competitive with ceramic matrix composites as a replacement for Ni-base superalloys in aircraft engine applications.

  18. MoSi2-Base Structural Composite Passed Engine Test

    NASA Technical Reports Server (NTRS)

    Nathal, Michael V.; Hebsur, Mohan G.

    1999-01-01

    The intermetallic compound molybdenum disilicide (MoSi2) is an attractive high-temperature structural material for advanced engine applications. It has excellent oxidation resistance, a high melting point, relatively low density, and high thermal conductivity; and it is easily machined. Past research at the NASA Lewis Research Center has resulted in the development of a hybrid composite consisting of a MoSi2 matrix reinforced with silicon nitride (Si3N4) particulate and silicon carbide (SiC) fibers. This composite has demonstrated attractive strength, toughness, thermal fatigue, and oxidation resistance, including resistance to "pest" oxidation. These properties attracted the interest of the Office of Naval Research and Pratt & Whitney, and a joint NASA/Navy/Pratt & Whitney effort was developed to continue to mature the MoSi2 composite technology. A turbine blade outer air seal, which was part of the Integrated High Performance Turbine Engine Technology (IHPTET) program, was chosen as a first component on which to focus.

  19. Improved Reflectance and Stability of Mo/Si Multilayers

    SciTech Connect

    Bajt, S.; Almeda, J.; Naree, T.; Clift, M.; Folta, A.; Kauffman, B.; Spiller, E.

    2001-10-22

    Commercial EUV lithographic systems require multilayers with higher reflectance and better stability then that published to date. Interface-engineered Mo/Si multilayers with 70% reflectance at 13.5 nm wavelength (peak width of 0.545 nm) and 71% at 12.7 nm wavelength (peak width of 0.49 nm) were developed. These results were achieved with 50 bilayers. These new multilayers consist of Mo and Si layers separated by thin boron carbide layers. Depositing boron carbide on interfaces leads to reduction in silicide formation on the Mo-on-Si interfaces. Bilayer contraction is reduced by 30% implying that there is less intermixing of Mo and Si to form silicide. As a result the Mo-on-Si interfaces are sharper in interface-engineered multilayers than in standard Mo/Si multilayers. The optimum boron carbide thicknesses have been determined and appear to be different for Mo-on-Si and Si-on-Mo interfaces. The best results were obtained with 0.4 nm thick boron carbide layer on the Mo-on-Si interface and 0.25 nm thick boron carbide layer on the Si-on-Mo interface. Increase in reflectance is consistent with multilayers with sharper and smoother interfaces. A significant improvement in oxidation resistance of EUV multilayers has been achieved with ruthenium terminated Mo/Si multilayers. The best capping layer design consists of a Ru layer separated from the last Si layer by a boron carbide layer. This design achieves high reflectance and the best oxidation resistance in a water vapor (i.e. oxidation) environment. Electron beam exposures of 4.5 hours in the presence of 5x10{sup -7} torr water vapor partial pressure show no measurable reflectance loss and no increase in the oxide thickness of Ru terminated multilayers. Longer exposures in different environments are necessary to test lifetime stability of many years.

  20. Recovery of Mo/Si multilayer coated optical substrates

    DOEpatents

    Baker, S.L.; Vernon, S.P.; Stearns, D.G.

    1997-12-16

    Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO{sub 2} overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates. 5 figs.

  1. Recovery of Mo/Si multilayer coated optical substrates

    DOEpatents

    Baker, Sherry L.; Vernon, Stephen P.; Stearns, Daniel G.

    1997-12-16

    Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO.sub.2 overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.

  2. Superplasticity of a multiphase refractory Mo-Si-B alloy

    SciTech Connect

    Jehanno, P.; Heilmaier, M.; Saage, H.; Heyse, Hartmut; Boening, Mike Boening; Kestler, Heinrich; Schneibel, Joachim H

    2006-01-01

    Mo-Si-B alloys consisting of a Mo solid solution and the intermetallic phases Mo{sub 3}Si and Mo{sub 5}SiB{sub 2} were synthesized by mechanical alloying followed by sintering and hot isostatic pressing to field an ultra-fine (triplex) microstructure with all three phases being in the sub-micron range. at temperatures as low as 1300C the material exhibits superplasticity, with tensile strain to failures of 200-400% at strain rates as high as 10{sup -3}s{sup -1}.

  3. MoSi2-Base Hybrid Composite Passed Engine Test

    NASA Technical Reports Server (NTRS)

    Keith, Theo G., Jr.; Hebsur, Mohan

    1998-01-01

    The intermetallics compound molybdenum disilicide (MoSi2) is an attractive high-temperature structural material for advanced engine applications. It has excellent oxidation resistance, a high melting point, relatively low density, and high thermal conductivity, and it is easily machined. Past research'at the NASA Lewis Research Center has resulted in the development of a hybrid composite consisting of a MoSi2 matrix reinforced with silicon nitride (Si3N4) Particulate and silicon carbide (SiC) fibers. This composite has demonstrated attractive strength, toughness, thermal fatigue, and oxidation resistance, including resistance to "pest" oxidation. These properties attracted the interest of the Office of Naval Research and Pratt & Whitney, and a joint NASA/Navy/Pratt & Whitney effort was developed to continue to mature the MoSi2 Composite technology. A turbine blade outer air seal, which was part of the Integrated High Performance Turbine Engine Technology (IHPTET) program, was chosen as a first component on which to focus. The first tasks of the materials development effort were to develop improved processing methods to reduce costs and to use fine-diameter fibers that enable the manufacturing of complex shapes. Tape-casting methods were developed to fully infiltrate the fine SiC fibers with matrix powders. The resulting composites were hot pressed to 100-percent density. Composites with cross-plied fiber architectures with 30 vol. % hi-nicalon SiC fibers and 30 vol. % nitride particles are now made routinely and demonstrate a good balance of properties. The next task entailed the measurement of a wide variety of mechanical properties to confirm the suitability of this composite in engines. In particular, participants in this effort demonstrated that composites made with Hi-Nicalon fibers had strength and toughness properties equal to or better than those of the composites made with the large-diameter fibers that had been used previously. Another critically

  4. Preparation of Protective MoSi2 Coating on Niobium Substrate

    NASA Astrophysics Data System (ADS)

    Yan, JianHui; Wang, Yi; Liu, LongFei; Wang, Yueming; Chen, Fang

    2015-08-01

    A protective MoSi2 coating on Nb substrate was prepared by air plasma spraying and annealing followed by siliconizing. The influence of annealing for plasma-sprayed Mo layer on the subsequent preparation of MoSi2 coating was investigated. Oxidation behavior of the MoSi2 coating was investigated at 1200 °C in air. Phase constituents and microstructure of the MoSi2 coating were characterized by x-ray diffraction and scanning electron microscopy. High-temperature annealing significantly decreases the porosity of the as-sprayed Mo coating (from 9.6 to 2.1%). After vacuum annealing, the splat boundaries and lamellar microstructure of the as-sprayed coating disappear and the recrystallized structure of the Mo coating appears. The MoSi2 coating falls off from the surface of the as-sprayed Mo coating during siliconizing process. The MoSi2 coating prepared on the annealed Mo layer surface has a dense microstructure, which shows a good interface bond between the coating and the Nb substrate. The coating has a multilayer structure, with MoSi2 outer layer, Mo middle layer, and Mo-Nb alloy inner layer. The MoSi2 coating exhibits an excellent oxidation resistance at 1200 °C in air.

  5. Pressureless sintering of MoSi{sub 2} materials

    SciTech Connect

    Scholl, R.; Juengling, T.; Kieback, B.

    1995-07-01

    Various powder mixtures were prepared by a modified mechanical alloying technique. Starting from elemental Mo-, Si and C-powders the influence of milling conditions on phase formation during the milling process and the subsequent beat treatment was investigated. Phase formation during sintering and sintering kinetics of activated starting mixtures were studied by differential scanning calorimetry (DSC), thermal graphimetry (TG), X-ray diffraction (XRD) and dilatometry. The results show that phase formation during milling or sintering strongly depends on milling conditions. Optimized powder mixtures of single phase and reinforced molybdenum silicides show high densities up to 98.5% TD by pressureless sintering in various atmospheres. Full density is possible by post-HIP because the samples show only closed porosity. The microstructure was studied in dependence of sintering parameters. The level of impurities, i.e. C, O{sub 2} was determined. Hardness, fracture toughness and bending strength were measured for single phase and particle reinforced materials.

  6. Characterization of Mo/Si multilayer growth on stepped topographies

    SciTech Connect

    Boogaard, A. J. R. vcan den; Louis, E.; Zoethout, E.; Goldberg, K. A.; Bijkerk, F.

    2011-08-31

    Mo/Si multilayer mirrors with nanoscale bilayer thicknesses have been deposited on stepped substrate topographies, using various deposition angles. The multilayer morphology at the stepedge region was studied by cross section transmission electron microscopy. A transition from a continuous- to columnar layer morphology is observed near the step-edge, as a function of the local angle of incidence of the deposition flux. Taking into account the corresponding kinetics and anisotropy in layer growth, a continuum model has been developed to give a detailed description of the height profiles of the individual continuous layers. Complementary optical characterization of the multilayer system using a microscope operating in the extreme ultraviolet wavelength range, revealed that the influence of the step-edge on the planar multilayer structure is restricted to a region within 300 nm from the step-edge.

  7. Aperiodic Mo/Si multilayers for hard x-rays.

    PubMed

    Pardini, Tom; Alameda, Jennifer; Platonov, Yuriy; Robinson, Jeff; Soufli, Regina; Spiller, Eberhard; Walton, Chris; Hau-Riege, Stefan P

    2016-08-01

    In this work we have developed aperiodic Molybdenum/Silicon (Mo/Si) multilayers (MLs) to reflect 16.25 keV photons at a grazing angle of incidence of 0.6° ± 0.05°. To the best of our knowledge this is the first time this material system has been used to fabricate aperiodic MLs for hard x-rays. At these energies new hurdles arise. First of all a large number of bilayers is required to reach saturation. This poses a challenge from the manufacturing point of view, as thickness control of each ML period becomes paramount. The latter is not well defined a priori, due to the thickness of the interfacial silicide layers which has been observed to vary as a function of Mo and Si thickness. Additionally an amorphous-to-crystalline transition for Mo must be avoided in order maintain reasonably low roughness at the interfaces. This transition is well within the range of thicknesses pertinent to this study. Despite these difficulties our data demonstrates that we achieved reasonably flat ML response across the angular acceptance of ± 0.05°, with an experimentally confirmed average reflectivity of 28%. Such a ML prescription is well suited for applications in the field of hard x-ray imaging of highly diverging sources. PMID:27505826

  8. Plastic anisotropy in MoSi{sub 2} single crystals

    SciTech Connect

    Mitchell, T.E.; Maloy, S.A.

    1993-05-01

    Single crystals Of MoSi{sub 2} are an order of magnitude stronger when compressed along [001] than along any other orientation. This is because the easy slip systems, <101><100> and <110><111>, have a zero Schmid factor acting on them so that harder slip systems are forced into operation. We find that [001] crystals compressed at 1OOO{degree}C yield by slip on <103><331>. TEM shows that the 1/2<331> dislocations tend to decompose into 1/2<111> and <110> dislocations. This decomposition process apparently inhibits the mobility of 1/2<331> dislocations at higher temperatures and another system, <101><1ll>, becomes operative at 1300{degree}C and above. [021] crystals have been tested for comparison and are found to yield at much lower stresses on the easy systems. In the design of advanced high temperature structural materials based on MOSi{sub 2}, the large plastic anisotropy should be used to advantage.

  9. Thermal conduction properties of Mo/Si multilayers for extreme ultraviolet optics

    NASA Astrophysics Data System (ADS)

    Bozorg-Grayeli, Elah; Li, Zijian; Asheghi, Mehdi; Delgado, Gil; Pokrovsky, Alexander; Panzer, Matthew; Wack, Daniel; Goodson, Kenneth E.

    2012-10-01

    Extreme ultraviolet (EUV) lithography requires nanostructured optical components, whose reliability can be influenced by radiation absorption and thermal conduction. Thermal conduction analysis is complicated by sub-continuum electron and phonon transport and the lack of thermal property data. This paper measures and interprets thermal property data, and their evolution due to heating exposure, for Mo/Si EUV mirrors with 6.9 nm period and Mo/Si thickness ratios of 0.4/0.6 and 0.6/0.4. We use time-domain thermoreflectance and the 3ω method to estimate the thermal resistance between the Ru capping layer and the Mo/Si multilayers (RRu-Mo/Si = 1.5 m2 K GW-1), as well as the out-of-plane thermal conductivity (kMo/Si 1.1 W m-1 K-1) and thermal anisotropy (η = 13). This work also reports the impact of annealing on thermal conduction in a co-deposited MoSi2 layer, increasing the thermal conductivity from 1.7 W m-1 K-1 in the amorphous phase to 2.8 W m-1 K-1 in the crystalline phase.

  10. Scatterometry based CD and profile metrology of MoSi/quartz structures

    NASA Astrophysics Data System (ADS)

    Yedur, Sanjay; Vuong, Vi; Shivaprasad, Deepak; Sarathy, T. P.; Tabet, Milad; Korlahalli, Rahul; Hu, Jiangtao

    2005-11-01

    As the on-wafer transistor sizes shrink, and gate nodes run well below 90 nm, it is becoming extremely important to accurately characterize and control the CDs on the Mask. Since Phase shift technology for masks is essential to achieve the geometries of the future, CD and profile metrology on the phase shifting materials becomes critical. Phase shift materials, such as MoSi, present unique challenges for metrology. In this paper, we discuss the effect of the optical properties of MoSi on CD and profile metrology and the challenges in obtaining the correct optical constants needed for accurate metrology. Optical Scatterometry based metrology was used successfully with both Spectroscopic Ellipsometry (SE; λ~ 210nm-1000nm) and Spectroscopic Polarized Reflectometry (Rp; λ: 320nm-780nm). Spectra were collected with Nanometrics' Atlas-M reticle measurement system and were analyzed using ODP software from Timbre Technologies, Inc. Unlike chrome, the optical properties of the MoSi on the grating structure differ significantly from that on the rest of the blanket area of the mask. Unique modeling techniques are required to account for this difference. Etching of the chrome also causes changes in the MoSi top layer that need to be accounted. Data will be presented showing the sensitivities of the CD structures on the mask to variations of Quartz and MoSi optical constants. CD and profile sensitivities to roughness of the MoSi grating structure are also demonstrated.

  11. Substrate recovery of Mo-Si multilayer coated optics

    SciTech Connect

    Stearns, D.G.; Baker, S.L.

    1993-06-01

    Imaging optics in a soft x-ray projection lithography (SXPL) system must meet stringent requirements to achieve high throughput and diffraction limited performance. Errors in the surface figure must be kept to less than {approximately}1 nm and the rms surface roughness must be less than 0.1 nm. The ML coatings must provide high reflectivity (> 60%) at wavelengths in the vicinity of 13 nm. The reflectivity bandpasses of the optics must be aligned within 0.05 nm. Each coating must be uniform across the surface of the optic to within 0.5%. These specifications challenge the limits of the current capabilities in optics fabrication and ML deposition. Consequently a set of qualified SXPL imaging optics is expected to be expensive, costing in the range of 100--250 k$. If the lifetime of the imaging optics is short, the replacement cost could significantly impact the economic competitiveness of the technology. The most likely failure modes for the imaging optics are mechanisms that degrade the ML coatings, but which leave the substrates intact. A potentially low cost solution for salvaging the imaging optics could be to strip the damaged ML coating to recover the substrate and then deposit a new coating. In this paper the authors report on the use of reactive ion etching (RIE) to remove Mo-Si ML coatings from precision optical substrates. The goal of this work was to characterize the etching process both in the ML film and at the substrate, and to determine the effects of the etching on the surface figure and finish of the substrate.

  12. Enhanced Electrochemical Performance of Heterogeneous Si/MoSi2 Anodes Prepared by a Magnesiothermic Reduction.

    PubMed

    Wu, Lili; Yang, Juan; Zhou, Xiangyang; Tang, Jingjing; Ren, Yongpeng; Nie, Yang

    2016-07-01

    This work explores facile synthesis of heterogeneous Si/MoSi2 nanocomposites via a one-step magnesiothermic reduction. MoSi2 serves as a highly electrically conductive nanoparticle that has several advantages of electrochemical properties, which is formed through the absorption of local heat accumulation generated by magnesiothermic reduction. As a result, the Si/MoSi2 nanocomposites exhibit excellent electrochemical performance, showing initial charge capacity of 1933.9 mA h g(-1) at a rate of 0.2 C and retaining 85.2% after 150 cycles. This work using local heat accumulation generated by magnesiothermic reduction demonstrates a large-scale method for producing high-performance Si-based anode materials, which could provide referential significances for other materials. PMID:27300698

  13. Crystal structure refinements of the κ phases in the Hf-Mo-Se and Hf-Mo-Ge systems

    NASA Astrophysics Data System (ADS)

    Ha˚rsta, Anders

    1985-05-01

    The crystal structures of κ-(Hf-Mo-Se) and κ-(Hf-Mo-Ge) were determined using X-ray single-crystal diffractometry. Both structures crystallize in the space group P6 3/mmc (No. 194) with the unit-cell dimensions a = 8.6995(4)A˚, c = 8.6234(7)A˚ for κ-(Hf-Mo-Se) and a = 8.6394(4)A˚, c = 8.6827(5)A˚ for κ-(Hf-Mo-Ge). The structures have been refined on F 2 to R(F 2) values of 0.0784 and 0.0661, respectively. κ-(Hf-Mo-Se) and κ-(Hf-Mo-Ge) are isostructural with κ-(Hf-Mo-P) with a variable degree of hafnium substitution on the molybdenum sites of the structure. In κ-(Hf-Mo-Ge) germanium vacancies were found to occur on the trigonal prismatic 2 c site and the phase was also found to contain oxygen on the octahedral 6g site. According to the final refinements the compositions are Hf 9+xMo 4-xSe with x = 0.40(2) and Hf 9+xMo 4- xGe yO 2 with x = 0.25(2), y = 0.88(1), and z = 1.47(12).

  14. Structure and formation kinetics of MoSi{sub 2} composites formed by reactive vapor infiltration process

    SciTech Connect

    Hillig, W.B.; Broglio, M.; Ramakrishnan, R.M.; Patibandla, N.

    1995-10-01

    Reactive Vapor Infiltration is a convenient new process for producing high purity MoSi{sub 2} matrix composites by reacting compacted mixed Mo + MoSi{sub 2} powders ranging from 0 to 80 wt. % MoSi{sub 2} with H{sub 2} + SiCl{sub 4} vapors at temperatures from 1,000 to 1,400 C. Consideration must be taken of the volumetric increase that accompanies this conversion. The kinetics of the advance of the MoSi{sub 2} growth layer and the gravimetric uptake are given as a function of temperature and the composition. The parabolic growth rate constant was independent of composition at least up to 30% MoSi{sub 2} composition, but then showed a strong, linear increase with increasing MoSi{sub 2} content. There appeared to be a leveling off of rate above 70% MoSi{sub 2}. The corresponding gravimetric rate constant was relatively insensitive to the starting MoSi{sub 2} content. This behavior is at variance with a simple one-dimensional diffusive growth model. Possible reasons for this variance are offered.

  15. Microstructure and Wear Resistance of Plasma-Sprayed Molybdenum Coating Reinforced by MoSi2 Particles

    NASA Astrophysics Data System (ADS)

    Yan, Jianhui; He, Zheyu; Wang, Yi; Qiu, Jingwen; Wang, Yueming

    2016-08-01

    Mo coatings with or without incorporated MoSi2 were fabricated by atmospheric plasma spraying, and their microstructure, microhardness, bond strength, and wear resistance were compared. Two kinds of spray powder, i.e., pure Mo and a blend of Mo and MoSi2, were sprayed onto low-carbon steel. Microstructural analysis of the MoSi2-Mo coating showed MoSi2 homogeneously distributed in a Mo matrix. Addition of MoSi2 particles increased the microhardness of the as-sprayed Mo coating. The adhesion strength of the Mo coating was better than that of the MoSi2-Mo coating. Wear test results showed that the wear rate and friction coefficient of the two coatings increased with increasing load, and the friction coefficient of the MoSi2-Mo coating was lower than that of the Mo coating. The MoSi2-Mo composite coating exhibited better wear resistance than the Mo coating. The wear failure mechanisms of the two coatings were local plastic deformation, delamination, oxidation, and adhesion wear.

  16. Nanoscale mapping of the W/Si(001) Schottky barrier

    SciTech Connect

    Durcan, Chris A.; Balsano, Robert; LaBella, Vincent P.

    2014-07-14

    The W/Si(001) Schottky barrier was spatially mapped with nanoscale resolution using ballistic electron emission microscopy (BEEM) and ballistic hole emission microscopy (BHEM) using n-type and p-type silicon substrates. The formation of an interfacial tungsten silicide is observed utilizing transmission electron microscopy and Rutherford backscattering spectrometry. The BEEM and BHEM spectra are fit utilizing a linearization method based on the power law BEEM model using the Prietsch Ludeke fitting exponent. The aggregate of the Schottky barrier heights from n-type (0.71 eV) and p-type (0.47 eV) silicon agrees with the silicon band gap at 80 K. Spatially resolved maps of the Schottky barrier are generated from grids of 7225 spectra taken over a 1 μm × 1 μm area and provide insight into its homogeneity. Histograms of the barrier heights have a Gaussian component consistent with an interface dipole model and show deviations that are localized in the spatial maps and are attributed to compositional fluctuations, nanoscale defects, and foreign materials.

  17. Processing and characterization of nanocrystalline molybdenum disilicide (MoSi{sub 2}) consolidated by hot isostatic pressing (HIP)

    SciTech Connect

    Haji-Mahmood, M.S.

    1995-02-10

    This work studied the effect nanocrystalline processing may have on mechanical properties of MoSi{sub 2} and the ease with which MoSi{sub 2} powder can be processed into a bulk shape. (MoSi{sub 2} presently is limited by poor strength above 1000 C and brittleness below DBTT.) This work studied cold and hot isostatic pressing (CIP, HIP). The attrited, CIPed, and HIPed samples were characterized by chemical analysis, XRD, SEM, microhardness, optical microscopy, and quantitative metallography (porosity, density). Fracture toughness of the nanocrystalline MoSi{sub 2} was found to be a factor of two higher than conventional MoSi{sub 2} and the hardness of 1500 C-HIPed compacts were higher, as well. Modulus test showed the calculated elastic constants to be higher than the original Cerac material.

  18. Infrared absorption of thin films MoSi2/SiNx micro-bridge

    NASA Astrophysics Data System (ADS)

    Jiang, Bo; Su, Yan; He, Yong; Wang, Kaiying

    2016-02-01

    In this paper, we report the infrared absorption and opto-electrical characteristics of multilayered thin films of MoSi2/SiNx with a micro-bridge structure. The thin films of MoSi2 deposited by radio frequency magnetron sputtering exhibit a relatively smooth surface (RMS roughness <1 nm, ˜0.98 Å/s), on which their square resistance is linearly increased from 340 to 550 Ω/sq. as the thickness decreases from 32 to 16 nm. Fourier transform infrared spectroscopy analysis indicates that the thin film MoSi2 with a thickness of ˜24 nm (450 Ω/sq.) presents the maximum infrared absorption on nearly dielectric thin film SiNx. Optical simulation verifies that the resistivity of the nearly dielectric thin film SiNx has an important influence on the infrared absorption of the thin film MoSi2. This work provides the physical understanding regarding the building of micro-bridges with the high infrared absorption.

  19. Evaluation of Mo-SiO{sub 2} continuous FGM`s. Final report

    SciTech Connect

    Tomsia, A.P.; Cannon, R.M.; McNaney, J.M.; Ishibashi, H.; Saiz, E.; MoberlyChan, W.; Becker, T.J.; Ritchie, R.O.

    1997-09-01

    The TOTO sponsored program at LBL involved characterization of continuous Mo-SiO{sub 2} FGMs in terms of microstructure, mechanical and thermal properties and corrosion resistance which would relate to the steady state, high temperature performance as well as the heating and cooling transients that occur at the beginning and end of operation in various applications.

  20. Long-term stability of a Mo/Si multilayer structure

    SciTech Connect

    Barbee, T.W. Jr. ); Rife, J.C.; Kowalski, M.P.; Cruddace, R.G.; Seely, J.F. ); Hunter, W.R. )

    1993-09-01

    The normal-incidence reflectance of a Mo/Si multilayer mirror, with peak reflectance near 130 A, was measured over a period of 20 months by using synchrotron radiation. The measured reflectances were unchanged over this period of time, and this indicates that the material layers and interfaces were stable.

  1. Characterization of electrical resistivity as a function of temperature in the Mo-Si-B system

    SciTech Connect

    Beckman, Sarah E.

    1999-12-10

    Measurements of electrical resistivity as a function of temperature from 25 to 1,500 C were conducted on polycrystalline samples in the Mo-Si-B system. Single phase, or nearly single phase, samples were prepared for the following phases: Mo{sub 3}Si, Mo{sub 5}SiB{sub 2}, Mo{sub 5}Si{sub 3}B{sub x}, MoB, MoSi{sub 2}, and Mo{sub 5}Si{sub 3}. Thesis materials all exhibit resistivity values within a narrow range(4--22 x 10{sup {minus}7}{Omega}-m), and the low magnitude suggests these materials are semi-metals or low density of states metals. With the exception of MoSi{sub 2}, all single phase materials in this study were also found to have low temperature coefficient of resistivity(TCR) values. These values ranged from 2.10 x 10{sup {minus}10} to 4.74 x 10{sup {minus}10}{Omega}-m/{degree} C, and MoSi{sub 2} had a TCR of 13.77 x 10{sup {minus}10}{Omega}-m/{degree} C. The results from the single phase sample measurements were employed in a natural log rule-of-mixtures model to relate the individual phase resistivity values to those of multiphase composites. Three Mo-Si-B phase regions were analyzed: the binary Mo{sub 5}Si{sub 3}-MoSi{sub 2} system, the ternary phase field Mo{sub 5}Si{sub 3}B{sub x}MoB-MoSi{sub 2}, and the Mo{sub 3}Si-Mo{sub 5}SiB{sub 2}-Mo{sub 5} Si{sub 3}B{sub x} ternary region. The experimental data for samples in each of these regions agreed with the natural log model and illustrated that this model can predict the electrical resistivity as a function of temperature of multi-phase, sintered samples within an error of one standard deviation.

  2. Mechanically Activated Combustion Synthesis of MoSi2-Based Composites

    SciTech Connect

    Shafirovich, Evgeny

    2015-09-30

    The thermal efficiency of gas-turbine power plants could be dramatically increased by the development of new structural materials based on molybdenum silicides and borosilicides, which can operate at temperatures higher than 1300 °C with no need for cooling. A major challenge, however, is to simultaneously achieve high oxidation resistance and acceptable mechanical properties at high temperatures. One approach is based on the fabrication of MoSi2-Mo5Si3 composites that combine high oxidation resistance of MoSi2 and good mechanical properties of Mo5Si3. Another approach involves the addition of boron to Mo-rich silicides for improving their oxidation resistance through the formation of a borosilicate surface layer. In particular, materials based on Mo5SiB2 phase are promising materials that offer favorable combinations of high temperature mechanical properties and oxidation resistance. However, the synthesis of Mo-Si-B multi-phase alloys is difficult because of their extremely high melting temperatures. Mechanical alloying has been considered as a promising method, but it requires long milling times, leading to large energy consumption and contamination of the product by grinding media. In the reported work, MoSi2-Mo5Si3 composites and several materials based on Mo5SiB2 phase have been obtained by mechanically activated self-propagating high-temperature synthesis (MASHS). Short-term milling of Mo/Si mixture in a planetary mill has enabled a self-sustained propagation of the combustion front over the mixture pellet, leading to the formation of MoSi2-T1 composites. Combustion of Mo/Si/B mixtures for the formation of T2 phase becomes possible if the composition is designed for the addition of more exothermic reactions leading to the formation of MoB, TiC, or TiB2. Upon ignition, Mo/Si/B and Mo/Si/B/Ti mixtures exhibited spin combustion, but the products were porous, contained undesired secondary phases, and had low oxidation resistance. It has been shown that use of

  3. Application of EB repair for high durable MoSi PSM

    NASA Astrophysics Data System (ADS)

    Kanamitsu, Shingo; Morishita, Keiko; Hirano, Takashi

    2014-07-01

    Recently there has been a demand for high durability MoSi masks. There are some candidates for MoSi mask materials. They are preferable for both mask user and mask manufacture because they show not only high durability against exposure or cleaning process but also process compatibility in production line[1]. They are gaining momentum to practical application. However, there is a drawback for manufacturing regarding the mask repair process. Because ebeam repair employs pure chemical reaction, it faces severe etching difficulty due to higher chemical stability. Meanwhile, the tool supplier has looked into that chemical reaction in detail since the problem was unveiled. They developed a dedicated etching process for high durable materials. It's so important for the mask manufacturer to evaluate this process properly before they transfer conventional MoSi to new high durability MoSi. A comprehensive understanding of this new process should be acquired by trying several kinds of etching tests. In this paper we will report the results ranging from basic etching rate, selectivity, repair accuracy to flexibility for complicated shaped defects. This data tells us a lot about if it can be applied for practical use. The experiment was performed with e-beam repair tool "MeRiTⓇ", which was released as the latest version from ZEISS last year. An improved new etching process was applied to "A6L2" type high durable blanks provided by HOYA corporation. A wide variety of programmed defects were arranged on a line and space featured test mask. These programmed defects were repaired with the procedure developed by ZEISS. After repair, printed image was evaluated by AIMSTM system. This paper will discuss the initial results of these first steps into the uncharted territory of high durability MoSi repair.

  4. Activated combustion features in the Mo-Si-C-promoter system and synthesis of MoSi{sub 2}-SiC composite powders

    SciTech Connect

    Hambartsumyan, A.A. Harutyunyan, A.B.

    2007-12-04

    Opportunities on combustion synthesizing the MoSi{sub 2}-SiC ceramic composites in a wide range of compositions under the chemical activated mode were studied. Molybdenum, silicon powders and carbon black were used as initial reagents, and Teflon was used as an activating additive. It was established that Teflon displays a dual (kinetic and thermal) impact on the interaction between reagents. The phasic character of the combustion process evolution, being characterized by low- and high-temperature regimes, was revealed. The end-products were subjected to SEM, XRD and chemical analyses.

  5. Oxidation and interdiffusion behavior of Niobium substrate coated MoSi2 coating prepared by spark plasma sintering

    NASA Astrophysics Data System (ADS)

    Yan, JianHui; Wang, Yi; Liu, LongFei; Wang, Yueming

    2014-11-01

    In order to protect Niobium material from oxidation, MoSi2 coating was prepared on the Niobium substrate by spark plasma sintering. Oxidation behavior of MoSi2 coating was investigated in air over the temperature range of 1200-1500 °C. The interfacial diffusion between MoSi2 coating and Niobium substrate was also examined. Dense MoSi2 coating was successfully prepared using spark plasma sintering. The porosities of top and side coatings are about 5.5% and 6.4%, respectively. No cracks were present in the MoSi2 coating. Cracking and spallation of the SiO2 scale did not occur at test temperatures. Two intermediate phases-(Nb,Mo)5Si3 and Nb5Si3 phases, were detected in the boundary of MoSi2 coating and Nb substrate. The growth of the reaction layer was dominated by the diffusion of Si toward the Nb substrate and obeyed a parabolic rate law. A multi-layered structural coating formed on Nb substrate, which consisted of MoSi2, (Mo,Nb)5Si3 and Nb5Si3 in turn.

  6. Processing and Properties of SiC/MoSi2-SiC Composites Fabricated by Melt Infiltration

    NASA Technical Reports Server (NTRS)

    Bhatt, Ramakrishna T.; Hebsur, Mohan G.

    2000-01-01

    Hi-Nicalon SiC fiber reinforced MoSi2-SiC matrix composites (SiC/MoSi2-SiC) have been fabricated by the melt infiltration approach. The composite consists of approximately 60 vol%, 2-D woven BN/SiC coated Hi-Nicalon SiC fibers and approximately 40 vol% MoSi2-SiC matrix. The room temperature tensile properties and thermal conductivity of the SiC/MoSi2-SiC composites were measured and compared with those of the melt infiltrated SiC/SiC composites. The influence oi fiber architecture on tensile properties was also evaluated. Results indicate that the primary modulus, stress corresponding to deviation from linearity, and transverse thermal conductivity values for the SiC/MoSi2-SiC composites are significantly lower than those for the SiC/SiC composites. Microcracking of the matrix due to the large difference in thermal expansion between MoSi2 and SiC appears to be the reason for the lower matrix dominated properties of SiC/MoSi2-SiC composites.

  7. Phase field simulation of a directional solidification of a ternary eutectic Mo-Si-B Alloy

    NASA Astrophysics Data System (ADS)

    Kazemi, O.; Hasemann, G.; Krüger, M.; Halle, T.

    2016-03-01

    We present a eutectic Phase-Field Model for a Mo-Si-B alloy at ternary eutectic composition (Mo-17.5Si-8B), under a constant thermal gradient. The process parameters like cooling rate and thermal gradient were obtained directly from the experimental procedure of zone melting. The equilibrium interface geometries and interface mobility were calculated using an isotropic model. The phase equilibria and the other thermodynamic parameters are obtained by linearizing the Mo-Si-B ternary phase diagram. We have investigated the effect of process parameters on the lamellar growth pattern and lamella pattern stability with respect to the Jackson-Hunt minimum undercooling spacing theory. In order to examine the generated results by the model, they were validated with experimental observed microstructures and measurements and showed to be in a good agreement with the experimental observations.

  8. Oxidation Behavior and Chlorination Treatment to Improve Oxidation Resistance of Nb-Mo-Si-B Alloys

    SciTech Connect

    Vikas Behrani

    2004-12-19

    This thesis is written in an alternate format. The thesis is composed of a general introduction, two original manuscripts, and a general conclusion. References cited within each chapter are given at the end of each chapter. The general introduction starts with the driving force behind this research, and gives an overview of previous work on boron doped molybdenum silicides, Nb/Nb{sub 5}Si{sub 3} composites, boron modified niobium silicides and molybdenum niobium silicides. Chapter 2 focuses on the oxidation behavior of Nb-Mo-Si-B alloys. Chapter 3 contains studies on a novel chlorination technique to improve the oxidation resistance of Nb-Mo-Si-B alloys. Chapter 4 summarizes the important results in this study.

  9. Investigation into the joining of MoSi{sub 2} to 316L stainless steel

    SciTech Connect

    Vaidya, R.U.; Bartlett, A.H.; Conzone, S.D.; Butt, D.P.

    1996-10-01

    Partial transient liquid phase joining and low temperature brazing were applied in joining MoSi{sub 2} to 316L ss. Exploratory studies were carried out on various interlayer materials. Mechanical, physical, and chemical compatibilities between various interlayers, brazing material, and substrate materials were investigated. Effect of thermal expansion mismatch between various components of the joint on the overall joint integrity was also studied. Preliminary findings are outlined.

  10. Chlorination treatment to improve the oxidation resistance of Nb-Mo-Si-B alloys

    NASA Astrophysics Data System (ADS)

    Behrani, Vikas; Thom, Andrew J.; Kramer, Matthew J.; Akinc, Mufit

    2005-03-01

    Recent studies have shown that the quaternary Nb-Mo-Si-B system is not oxidation resistant. The difference in oxidation resistance between Mo-Si-B and Nb-Mo-Si-B may be interpreted in terms of the volatility of the metal oxide that forms. MoO3 evaporates from the surface scale at about 650 °C, leaving a porous borosilicate glassy scale. Nb2O5 persists as a rapidly growing condensed phase that overwhelms the ability of the borosilicate glass to form a protective layer. In the present work, a novel chlorination process was employed to selectively remove Nb2O5 from the scale of the quaternary alloy as volatile NbCl5. A Nb-Mo-Si-B alloy was studied with a nominal composition of 63(Nb,Mo)-30Si-7B (at. pct) with Nb/Mo = 1:1. The alloy consisted of a three-phase microstructure of (Nb,Mo)5Si3B x (T1)-(Nb,Mo)5(Si,B)3 (T2)-(Nb,Mo)5Si3B x (D88). The oxidation behavior of these alloys in air was studied both before and after chlorination. Results showed that Nb2O5 can be selectively removed from the scale to leave a borosilicate-rich scale, which then forms a dense scale after heat treatment at 1100 °C in argon. The oxidation rate of the chlorinated alloy was about one-third that of the unchlorinated alloy under identical conditions. Alloy oxidation during heating to the test temperature was studied, and a plausible mechanism for the formation of porosity in the oxide scale has been offered.

  11. High temperature corrosion of MoSi2 HfO2 composites in coal slag

    NASA Astrophysics Data System (ADS)

    Mueller, Michael; Hilpert, Klaus; Singheiser, Lorenz

    2005-02-01

    The corrosion behaviour of MoSi2 15%HfO2 composites was investigated under simulated Pressurized Pulverized Coal Combustion (PPCC) conditions at 1450 °C in the presence of liquid slag. The composites form a dense glassy corrosion product layer which consists mainly of SiO2 and HfSiO4. The specimens show relative good corrosion resistance against coal slag in comparison to most commercial available ceramic materials.

  12. Effect of microstructure on the properties of MoSi{sub 2} and its composites

    SciTech Connect

    Newman, A.; Jewett, T.; Sampath, S.; Herman, H.

    1997-12-31

    The effects of processing on the microstructure and properties of MoSi{sub 2} are examined. A diverse array of samples, processed through a variety of means, were investigated for their microstructural features and indentation fracture behavior. Results from this study indicate that a finely dispersed secondary phase enhances tortuous crack paths, crack branching, and microcracking, thereby improving fracture toughness. The effects of substitutional alloying (Re, Al) and composite additions (SiC) have also been investigated.

  13. FeAl and Mo-Si-B Intermetallic Coatings Prepared by Thermal Spraying

    SciTech Connect

    Totemeier, T.C.; Wright, R.N.; Swank, W.D.

    2003-04-22

    FeAl and Mo-Si-B intermetallic coatings for elevated temperature environmental resistance were prepared using high-velocity oxy-fuel (HVOF) and air plasma spray (APS) techniques. For both coating types, the effect of coating parameters (spray particle velocity and temperature) on the microstructure and physical properties of the coatings was assessed. Fe-24Al (wt.%) coatings were prepared using HVOF thermal spraying at spray particle velocities varying from 540 m/s to 700 m/s. Mo-13.4Si-2.6B coatings were prepared using APS at particle velocities of 180 and 350 m/s. Residual stresses in the HVOF FeAl coatings were compressive, while stresses in the APS Mo-Si-B coatings were tensile. In both cases, residual stresses became more compressive with increasing spray particle velocity due to increased peening imparted by the spray particles. The hardness and elastic moduli of FeAl coatings also increased with increasing particle velocity, again due to an increased peening effect. For Mo-Si-B coatings, plasma spraying at 180 m/s resulted in significant oxidation of the spray particles and conversion of the T1 phase into amorphous silica and {alpha}-Mo. The T1 phase was retained after spraying at 350 m/s.

  14. MoSi 2 Oxidation in 670-1498 K Water Vapor

    DOE PAGESBeta

    Sooby Wood, Elizabeth; Parker, Stephen S.; Nelson, Andrew T.; Maloy, Stuart A.; Butt, D.

    2016-03-08

    Molybdenum disilicide (MoSi2) has well documented oxidation resistance at high temperature (T > 1273 K) in dry O2 containing atmospheres due to the formation of a passive SiO2 surface layer. But, its behavior under atmospheres where water vapor is the dominant species has received far less attention. Oxidation testing of MoSi2 was performed at temperatures ranging from 670–1498 K in both 75% water vapor and synthetic air (Ar-O2, 80%–20%) containing atmospheres. Here the thermogravimetric and microscopy data describing these phenomena are presented. Over the temperature range investigated, MoSi2 displays more mass gain in water vapor than in air. The oxidationmore » kinetics observed in water vapor differ from that of the air samples. Two volatile oxides, MoO2(OH)2 and Si(OH)4, are thought to be the species responsible for the varied kinetics, at 670–877 K and at 1498 K, respectively. Finally, we observed an increase in oxidation (140–300 mg/cm2) from 980–1084 K in water vapor, where passivation is observed in air.« less

  15. Impression creep behavior of SiC particle-MoSi{sub 2} composites

    SciTech Connect

    Butt, D.P.; Korzekwa, D.A.; Maloy, S.A.; Kung, H.; Petrovic, J.J.

    1996-06-01

    Using a cylindrical indenter (or punch), the impression creep behavior of MoSi{sub 2}-SiC composites containing 0{endash}40{percent} SiC by volume, was characterized at 1000{endash}1200{degree}C, 258{endash}362 MPa punch pressure. Through finite element modeling, an equation that depends on the material stress exponent was derived that converts the stress distribution beneath the punch to an effective compressive stress. Using this relationship, direct comparisons were made between impression and compressive creep studies. Under certain conditions, compressive creep and impression creep measurements yield comparable results after correcting for effective stresses and strain rates beneath the punch. However, rate-controlling mechanisms may be quite different under the two stressing conditions, in which case impression creep data should not be used to predict compressive creep behavior. The addition of SiC affects the impression creep behavior of MoSi{sub 2} in a complex manner by pinning grain boundaries during pressing, thus leading to smaller MoSi{sub 2} grains and by obstructing or altering both dislocation motion and grain boundary sliding. {copyright} {ital 1996 Materials Research Society.}

  16. Extended Functionality of Environmentally-Resistant Mo-Si-B-Based Coatings

    NASA Astrophysics Data System (ADS)

    Perepezko, J. H.; Sakidja, R.

    2013-02-01

    Multiphase Mo-Si-B alloys with compositions which yield the ternary intermetallic Mo5SiB2 (T2) phase as a key microstructure constituent together with the Mo and Mo3Si phases, offer an attractive balance of high melting temperature, oxidation resistance, and mechanical properties. The investigation of reaction kinetics involving the T2 phase enables the analysis of oxidation in terms of diffusion pathways and the design of effective coatings. From this basis, kinetic biasing is used together with pack cementation to develop Mo-Si-B-based multilayered coatings with an aluminoborosilica surface and in situ diffusion barriers with self-healing characteristics for enhanced oxidation resistance. While a combustion environment contains water vapor that can accelerate an attack of silica-based coatings, the Mo-Si-B-based coatings provide oxidation resistance in water vapor up to at least 1,500°C. An exposure to hot ionized gas species generated in an arc jet confirms the robust coating performance in extreme environments. To extend the application beyond Mo-based systems, a two-stage process has been implemented to provide effective oxidation resistance for refractory metal cermets, SiC and ZrB2 ultra-high-temperature composites.

  17. Characterization of structure and mechanical properties of MoSi{sub 2}-SiC nanolayer composites

    SciTech Connect

    Kung, H.; Jervis, T.R.; Nastasi, M.; Mitchell, T.E.; Hirvonen, J.P.

    1993-12-31

    A systematic study of structure-mechanical properties relation is reported for MoSi{sub 2}-SiC nanolayer composites. Alternating layers of MoSi{sub 2} and SiC were synthesized by DC magnetron and rf-diode sputtering, respectively. Cross-sectional transmission electron microscopy was used to examine three distinct reactions in the specimens when exposed to different annealing conditions: Crystallization and phase transformation of MoSi{sub 2}, crystallization of SiC, and spheroidization of the layer structures. Nanoindentation was employed to characterize the mechanical response as a function of structural changes. As-sputtered material exhibits amorphous structures in both types of layers and has a hardness of 11 GPa and a modulus of 217GPa. Subsequent heat treatment induces crystallization of MoSi{sub 2} to form the C40 structure at 500C and SiC to form the a structure at 700C. The crystallization process is directly responsible for hardness and modulus increase in multilayers. A hardness of 24GPa and a modulus of 340GPa can be achieved through crystallizing both MoSi{sub 2} and SiC layers. Annealing at 900C for 2h causes the transformation of MoSi{sub 2} into the C11{sub b} structure, as well as spheroidization of the layering to form a nanocrystaulline equiaxed microstructure. A slight degradation in hardness but not in modulus is observed accompanying the layer break-down.

  18. Processing of Mo-Si-B intermetallics by extrusion and oxidation properties of the extruded Tl-MoSi{sub 2}-MoB System

    SciTech Connect

    Summers, Eric

    1999-11-08

    An extrusion process was developed that is able to consistently produce large quantities of Mo-Si-B rods without the presence of defects. Binder removal from the extruded rods was studied in detail and it was determined that heating rates on the order of 0.02{degree}/minute (1.2{degree}/hour) are necessary to remove the binder without the formation of defects. This low heating rate resulted in debinding times in excess of 70 hours (approximately 3 days). Wicking was investigated as a means to decrease the time necessary for binder removal. Using 0.05{micro}m alumina powder as a wicking agent, binder removal times were reduced to 10 hours with heating rates up to 1{degree}/minute employed without defect formation. Once the extrusion process was complete the oxidation properties of the Tl-MoSi{sub 2}-MoB extruded phase assemblage was investigated. It was determined that this composition exhibits catastrophic oxidation or pesting in the temperature range of 660--760 C, resulting in the material turning to dust. Outside of this temperature range the composition is oxidatively stable. Continuous mass measurements were taken at 1,300, 1,450, and 1,600 C to determine the oxidation rate constants of this material. Parabolic rate constants of 6.9 x 10{sup {minus}3}, 1.3 x 10{sup {minus}3}, and 9.1 x 10{sup {minus}3} mg{sup 2}/cm{sup 4}/hr were determined for 1,300, 1,450, and 1,600 C respectively.

  19. Novel Processing of mo-si-b Intermetallics for improved efficiency of power systems

    SciTech Connect

    M.J. Kramer; O. Degirmen; A.J. Thom; M. Akinc

    2004-09-30

    Multiphase composite alloys based on the Mo-Si-B system are candidate materials for ultra-high temperature applications. In non load-bearing applications such as thermal barrier coatings or heat exchangers in fossil fuel burners, these materials may be ideally suited. Alloys based on the Mo{sub 5}Si{sub 3}B{sub x} phase (Tl phase) possess excellent oxidation resistance to at least 1600 C in synthetic air atmospheres. However, the ability of Tl-based alloys to resist aggressive combustion environments has not yet been determined. The present work seeks to investigate the resistance of these Mo-Si-B alloys to simulated combustion atmospheres. Material was pre-alloyed by combustion synthesis, and samples for testing were prepared by classic powder metallurgical processing techniques. Precursor material synthesized by self-heating-synthesis was sintered to densities exceeding 98% in an argon atmosphere at 1800 C. The approximate phase assemblage of the material was 57% Tl, 29% MoB, 14% MoSi{sub 2} (wt%). The alloy was oxidized from 1000-1100 C in flowing air containing water vapor at 18 Torr. At 1000 C the material achieved a steady state mass loss, and at 1100 C the material undergoes a steady state mass gain. The oxidation rate of these alloys in this temperature regime was accelerated by the presence of water vapor compared to oxidation in dry air. The results of microstructural analysis of the tested alloys will be discussed. Techniques and preliminary results for fabricating near-net-shaped parts will also be presented.

  20. Temperature dependent mechanical properties of Mo-Si-B compounds via ab initio molecular dynamics

    NASA Astrophysics Data System (ADS)

    Dharmawardhana, C. C.; Sakidja, R.; Aryal, S.; Ching, W. Y.

    2013-07-01

    A new method was proposed to obtain high temperature mechanical properties with a combination of ab initio molecular dynamics and stress-strain analyses. It was applied to compounds in the Mo-Si-B ternary system, namely, T1 (Mo5Si3) and T2 (Mo5SiB2) phases. The calculated coefficient of thermal expansion, thermal expansion anisotropy, and elastic constants agree well with those from the available experiments. The method enables us to theoretically access these properties up to 2000 K.

  1. Polymer-Derived Ceramics as Innovative Oxidation Barrier Coatings for Mo-Si-B Alloys

    NASA Astrophysics Data System (ADS)

    Hasemann, Georg; Baumann, Torben; Dieck, Sebastian; Rannabauer, Stefan; Krüger, Manja

    2015-04-01

    A preceramic polymer precursor, perhydropolysilazane, is used to investigate its function as a new type of oxidation barrier coating on Mo-Si-B alloys. After dip-coating and pyrolysis at 1073 K (800 °C), dense and well-adhering SiON ceramic coatings could be achieved, which were investigated by SEM and cyclic oxidation tests at 1073 K and 1373 K (800 °C and 1100 °C). The coating is promising in reducing the mass loss during the initial stage of oxidation exposure at 1373 K (1100 °C) significantly.

  2. Microstructure of a plasma-sprayed Mo-Si-B alloy

    NASA Astrophysics Data System (ADS)

    Kramer, M. J.; Okumus, S. C.; Besser, M. F.; Ünal, Ö.; Akinc, M.

    2000-03-01

    Powders of Mo52Si38B10 were plasma sprayed under inert conditions onto stainless steel substrates to determine if high density free standing forms could be synthesized by this process. Thermal spray conditions were varied to minimize porosity and oxygen impurities while minimizing evaporative metal losses. The assprayed and sintered microstructures were characterized using scanning and transmission electron microscopy and quantitative x-ray diffraction (XRD). The as-sprayed microstructure consisted of elongated splats tens of microns in length and only one to three microns in thickness. The splats contained submicrometer grains of primarily MoB and Mo5Si3B x (T1) and minor amounts of MoSi2 and a glassy grain boundary phase. The interior of the splats typically consisted of a fine eutectic of MoB and T1. Small pieces were cut out of the cross section of the sample and pressureless sintered for 2, 6, and 10 h at 1800 °C in flowing Ar. After sintering for 2 h at 1800 °C, the samples exhibited a coarser but equiaxed microstructure (1 to 5 µm grain size) containing 78 vol.% T1, 16 vol.% MoB, and 6 vol.% MoSi2 as determined by XRD. Approximately 8 at.% of the Si formed silica. The high-temperature anneal removed all vestiges of the layered structure observed in the as-sprayed samples.

  3. Creep Resistance and Oxidation Behavior of Novel Mo-Si-B-Ti Alloys

    NASA Astrophysics Data System (ADS)

    Azim, M. A.; Schliephake, D.; Hochmuth, C.; Gorr, B.; Christ, H.-J.; Glatzel, U.; Heilmaier, M.

    2015-11-01

    Mo-Si-B-alloys are promising materials for high-temperature applications because of their high melting point, excellent phase stability, large alloying capabilities, and reasonable mechanical as well as oxidative properties. A continuing alloy development is, however, required because of the catastrophic oxidation taking place at intermediate temperatures and the rather high density. The addition of Ti stabilizes a new ternary phase field including the Mo5Si3 (T1) phase instead of the Mo3Si (A15) phase. Alloys comprising the phases Moss, T1 and Mo5SiB2 (T2) show very high creep resistance, improved oxidation behavior and significantly reduced density. The new T1 phase seems to play a crucial role in the improved oxidation resistance of these new materials, since this phase exhibits excellent oxidation behavior at intermediate and high temperatures. The 4-component alloys possess superior creep behavior compared to Mo-Si-B alloys with the same microstructural phase arrangement and size or to the single crystal Ni-base superalloy CMSX-4. The main reason was found to be the formation of Ti-rich silicide precipitates during processing.

  4. Thermal shock behavior of alumina/MoSi2 plasma sprayed laminated composites

    SciTech Connect

    Castro, R. G.; Petrovic, J. J.; Vaidya, R. U.; Mendoza, D.

    2001-01-01

    Alumina (Al{sub 2}O{sub 3}) is very susceptible to thermal shock, which leads to strength degradation. By reinforcing Al{sub 2}O{sub 3} with molybdenum disilicide (MoSi{sub 2}) layers, the tolerance to damage caused by thermal shock can be improved. The thermal shock resistance of plasma sprayed Al{sub 2}O{sub 3}/MoSi{sub 2} laminated composites were investigated. Three laminate microstructures having different layer thickness were fabricated by atmospheric plasma spraying while maintaining a 50/50-volume fraction. Quenching experiments done on 4-point bend bars showed a gradual decrease in the strength as the change in temperature ({Delta}T) increased. Thermal shock resistant parameters (R{prime} and R-quadruple prime) provided a representative numerical value of the thermal shock resistance for the laminated composites. The corresponding material properties for the different microstructures were determined experimentally in order to calculate the R{prime} and R quadruple prime values. The intermediate layered composite showed the highest R-quadruple prime va1ue at 1061 {micro}m, while the thin layered composite had the highest R{prime} value at 474 W/m.

  5. Phase stability and alloying behavior in the Mo-Si-B system

    NASA Astrophysics Data System (ADS)

    Sakidja, R.; Perepezko, J. H.

    2005-03-01

    The effect of transition metal (TM) substitution for Mo has been examined in terms of the phase stability and multiphase microstructures in the Mo-Si-B ternary system. The metal-rich portion of the ternary Mo-Si-B system at equilibrium is comprised of thermally stable bcc Mo(ss) phase, a ternary-based Mo5SiB2 (T2) phase, and a binary-based metal-rich silicide (Mo3Si [A15]). The structures that are developed by following systematic alloying with a wide range of TMs, which are substitutional in both Mo(ss) and T2 phases (group IVB, VB, and VIB metals), have been analyzed to elucidate the roles of the substitution on the stability of the three phase fields of Mo(ss) + T2 + Mo3Si. In particular, the borosilicide ternary-based T2 phase shows an extended solid solution with a wide range of TMs. The extended solubility in the T2 phase essentially mimics the alloying behavior of the TM-based bcc phase. The critical factor for the phase stability appears to be the existence of a unique feature of bcc-like TM clusters within the T2 lattice structure. The combined criteria of atomic size factor and the valence electron concentration per atom (e/a) have been used to elucidate the observed alloying behavior.

  6. Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography

    SciTech Connect

    Bajt, S; Clift, W M; Folta, J A; Gullikson, E M; Klebanoff, L E; Kleineberg, U; Malinowski, M E; Wedowski, M

    1999-08-05

    Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor industry in the production of sub-100 nm feature sizes in integrated circuits. Using multilayer reflective coatings optimized at wavelengths ranging from 11 to 14 nm, EUVL represents a potential successor to currently existing optical lithography techniques. In order to assess lifetimes of the multilayer coatings under realistic conditions, a series of radiation stability tests has been performed. In each run a dose of EUV radiation equivalent to several months of lithographic operation was applied to Mo/Si and MO/Be multilayer coatings within a few days. Depending on the residual gas concentration in the vacuum environment, surface deposition of carbon during the exposure lead to losses in the multilayer reflectivity. However, in none of the experimental runs was structural damage within the bulk of the multilayers observed. Mo/Si multilayer coatings recovered their full original reflectivity after removal of the carbon layer by an ozone cleaning method. Auger depth profiling on MO/Be multilayers indicate that carbon penetrated into the Be top layer during illumination with high doses of EUV radiation. Subsequent ozone cleaning fully removed the carbon, but revealed enhanced oxidation of the area illuminated, which led to an irreversible loss in reflectance on the order of 1%. Keywords: Extreme ultraviolet (EUV) lithography, multilayer reflective coatings, radiation stability, surface contamination

  7. Mo-Si-B alloys for ultrahigh-temperature structural applications.

    PubMed

    Lemberg, J A; Ritchie, R O

    2012-07-10

    A continuing quest in science is the development of materials capable of operating structurally at ever-increasing temperatures. Indeed, the development of gas-turbine engines for aircraft/aerospace, which has had a seminal impact on our ability to travel, has been controlled by the availability of materials capable of withstanding the higher-temperature hostile environments encountered in these engines. Nickel-base superalloys, particularly as single crystals, represent a crowning achievement here as they can operate in the combustors at ~1100 °C, with hot spots of ~1200 °C. As this represents ~90% of their melting temperature, if higher-temperature engines are ever to be a reality, alternative materials must be utilized. One such class of materials is Mo-Si-B alloys; they have higher density but could operate several hundred degrees hotter. Here we describe the processing and structure versus mechanical properties of Mo-Si-B alloys and further document ways to optimize their nano/microstructures to achieve an appropriate balance of properties to realistically compete with Ni-alloys for elevated-temperature structural applications. PMID:22711489

  8. Mechanical characterization of SiC whisker-reinforced MoSi/sub 2/

    SciTech Connect

    Carter, D.H.; Gibbs, W.S.; Petrovic, J.J.

    1988-01-01

    The mechanical characteristics of an intermetallic matrix with two different reinforcements were studied. The matrix material was MoSi/sub 2/, with either Los Alamos VLS SiC whiskers or Huber VS SiC whiskers. The purpose of the reinforcement was to provide toughening at ambient temperature and strengthening at elevated temperatures. The VLS whiskers greatly improved the yield strength of the matrix at 1200/degree/C, and also increased the room temperature fracture toughness of the matrix. The VS whiskers were added because they are much smaller in length and diameter, and therefore decreased the mean free path between whiskers, at the same volume fraction. The VS whiskers improved the toughness of the matrix at ambient temperature, and increased the yield strength of MoSi/sub 2/ at 1400/degree/C by 470%. The high strength of this new composite places this material in the realm of attractive engineering materials for high-temperature applications. 11 refs., 6 refs., 1 tab.

  9. Mechanically alloyed Mo-Si-B alloys with a continuous a-Mo matrix and improved mechanical properties

    SciTech Connect

    Krueger, M.; Franz, S.; Heilmaier, M.; Schneibel, Joachim H; Jehanno, P.; Boening, Mike Boening; Kestler, Heinrich

    2008-01-01

    Mechanical alloying (MA) followed by cold isostatic pressing (CIPing), sintering and hot isostatic pressing (HIPing) was used to prepare Mo-base silicide alloys consisting of a Mo(Si) solid solution and the intermetallic phases Mo{sub 3}Si and Mo{sub 5}SiB{sub 2}. The microstructural development during milling of both binary Mo-Si and Mo-B and ternary Mo-Si-B powder mixtures was evaluated. While obtaining a supersaturated solid solution requires rather long milling times, domain size (which correlates with the grain size) is reduced to below 100 {angstrom} after about 10 h of milling. After heat treatment and consolidation the microstructure reveals a continuous {alpha}-Mo matrix with embedded, uniformly distributed intermetallic particles. The establishment of such a microstructure is beneficial for the mechanical properties since, as compared to a discontinuous {alpha}-Mo matrix, it decreases the brittle-to-ductile transition temperature (BDTT) by about 150 K.

  10. High-efficiency superconducting nanowire single-photon detectors fabricated from MoSi thin-films.

    PubMed

    Verma, V B; Korzh, B; Bussières, F; Horansky, R D; Dyer, S D; Lita, A E; Vayshenker, I; Marsili, F; Shaw, M D; Zbinden, H; Mirin, R P; Nam, S W

    2015-12-28

    We report on MoSi SNSPDs which achieved high system detection efficiency (87.1 ± 0.5% at 1542 nm) at 0.7 K and we demonstrate that these detectors can also be operated with saturated internal efficiency at a temperature of 2.3 K in a Gifford-McMahon cryocooler. We measured a minimum system jitter of 76 ps, maximum count rate approaching 10 MHz, and polarization dependence as low as 3.3 ± 0.1%. The performance of MoSi SNSPDs at 2.3 K is similar to the performance of WSi SNSPDs at < 1 K. The higher operating temperature of MoSi SNSPDs makes these devices promising for widespread use due to the simpler and less expensive cryogenics required for their operation. PMID:26832040

  11. Thermoelectric properties of bulk MoSi2 synthesized by solid state microwave heating

    NASA Astrophysics Data System (ADS)

    Lan, Yu; Xie, Mianyu; Ouyang, Ting; Yue, Song

    2016-07-01

    In this research, single phase α-MoSi2 was prepared by solid state hybrid microwave heating within 90 min at relatively low temperature 1273 K. Such precursor powders were then ball milled and sintered by microwave heating at different temperatures. The thermoelectric (TE) properties of MoSi2 bulks were investigated in the temperature range of 300-673 K. When the sintering temperature increases from 973 K to 1273 K, the electrical resistivity decreases significantly and the Seebeck coefficients increase obviously, leading to the maximum TE powder factor of 6.2 × 10‑6Wm‑1K‑2 at 673 K. These results demonstrate the feasibility of high efficient and economical synthesis of MoSi2 by microwave heating technique, with the final products having comparable TE performance in comparison to those from typical methods with long duration and energy-extensive consumption.

  12. Chemical vapor deposition of W-Si-N and W-B-N

    DOEpatents

    Fleming, James G.; Roherty-Osmun, Elizabeth Lynn; Smith, Paul M.; Custer, Jonathan S.; Jones, Ronald V.; Nicolet, Marc-A.; Madar, Roland; Bernard, Claude

    1999-01-01

    A method of depositing a ternary, refractory based thin film on a substrate by chemical vapor deposition employing precursor sources of tungsten comprising WF.sub.6, either silicon or boron, and nitrogen. The result is a W--Si--N or W--B--N thin film useful for diffusion barrier and micromachining applications.

  13. Chemical vapor deposition of W-Si-N and W-B-N

    DOEpatents

    Fleming, J.G.; Roherty-Osmun, E.L.; Smith, P.M.; Custer, J.S.; Jones, R.V.; Nicolet, M.; Madar, R.; Bernard, C.

    1999-06-29

    A method of depositing a ternary, refractory based thin film on a substrate by chemical vapor deposition employing precursor sources of tungsten comprising WF[sub 6], either silicon or boron, and nitrogen. The result is a W-Si-N or W-B-N thin film useful for diffusion barrier and micromachining applications. 10 figs.

  14. The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

    SciTech Connect

    Pershyn, Yuriy; Gullikson, Erik; Artyukov, Igor; Kondratenko, Valeriy; Sevryukova, Victoriya; Voronov, Dmitriy; Zubarev, Evgeniy; Vinogradov, Alexander

    2011-08-08

    Impact of Ar gas pressure (1-4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering ({lambda} = 0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers.

  15. Oxidation Behavior of Mo-Si-B Alloys in Wet Air

    SciTech Connect

    M. Kramer; A. Thom; O. Degirmen; V. Behrani; M. Akinc

    2002-04-22

    Multiphase composite alloys based on the Mo-Si-B system are candidate materials for ultra-high temperature applications. In non load-bearing uses such as thermal barrier coatings or heat exchangers in fossil fuel burners, these materials may be ideally suited. The present work investigated the effect of water vapor on the oxidation behavior of Mo-Si-B phase assemblages. Three alloys were studied: Alloy 1 = Mo{sub 5}Si{sub 3}B{sub x} (T1)- MoSi{sub 2}- MoB, Alloy 2 = T1- Mo{sub 5}SiB{sub 2} (T2)- Mo{sub 3}Si, and Alloy 3 = Mo- T2- Mo{sub 3}Si. Tests were conducted at 1000 and 1100C in controlled atmospheres of dry air and wet air nominally containing 18, 55, and 150 Torr H{sub 2}O. The initial mass loss of each alloy was approximately independent of the test temperature and moisture content of the atmosphere. The magnitude of these initial losses varied according to the Mo content of the alloys. All alloys formed a continuous, external silica scale that protected against further mass change after volatilization of the initially formed MoO{sub 3}. All alloys experienced a small steady state mass change, but the calculated rates cannot be quantitatively compared due to statistical uncertainty in the individual mass measurements. Of particular interest is that Alloy 3, which contains a significant volume fraction of Mo metal, formed a protective scale. All alloys formed varying amounts of subscale Mo and MoO{sub 2}. This implies that oxygen transport through the external silica scale has been significantly reduced. For all alloys, water vapor accelerated the growth of a multiphase interlayer at the silica scale/unoxidized alloy interface. This interlayer is likely composed of fine Mo and MoO{sub 2} that is dispersed within a thin silica matrix. Alloy 3 was particularly sensitive to water accelerated growth of this interlayer. At 1100 C, the scale thickness after 300 hours increased from about 20 mm in dry air to nearly 100 mm in wet air.

  16. Plastic deformation of Mo(Si,Al){sub 2} single crystals with C40 structure

    SciTech Connect

    Moriwaki, M.; Ito, K.; Inui, H.; Yamaguchi, M.

    1997-12-31

    The deformation behavior of single crystals of Mo(Si,Al){sub 2} with the C40 structure has been studied as a function of crystal orientation and Al content in the temperature range from room temperature to 1,500 C in compression. Plastic flow is possible only above 1,100 C for orientations where slip along <11{bar 2}0> on (0001) is operative and no other slip systems are observed over whole temperature range investigated. The critical resolved shear stress for basal slip decreases rapidly with increasing temperature and the Schmid law is valid. Basal slip appears to occur through a synchroshear mechanism, in which a-dislocations (b = 1/3 <11{bar 2}0>) dissociate into two synchro-partial dislocations with the identical Burgers vector (b = 1/6 <11{bar 2}0>) and each synchro-partial further dissociates into two partials on two adjacent planes.

  17. High reflectance-low stress Mo-Si multilayer reflective coatings

    DOEpatents

    Montcalm, Claude; Mirkarimi, Paul B.

    2000-01-01

    A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

  18. Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings

    DOEpatents

    Montcalm, Claude; Mirkarimi, Paul B.

    2001-01-01

    A high reflectance-low stress Mo--Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

  19. Control of lateral thickness gradients of Mo-Si multilayer on curved substrates using genetic algorithm.

    PubMed

    Yu, Bo; Jin, Chunshui; Yao, Shun; Li, Chun; Wang, Hui; Zhou, Feng; Guo, Benyin; Xie, Yao; Liu, Yu; Wang, Liping

    2015-09-01

    An inversion method based on a genetic algorithm has been developed to control the lateral thickness gradients of a Mo-Si multilayer deposited on curved substrates by planar magnetron sputtering. At first, the sputtering distribution of the target is inversed from coating thickness profiles of flat substrates at different heights. Then, the speed profiles of substrates sweeping across the target are optimized according to the desired coating thickness profiles of the primary and secondary mirrors in a two-bounce projection system. The measured coating thickness profiles show that the non-compensable added figure error is below 0.1 nm rms, and the wavelength uniformity across each mirror surface is within ±0.2% P-V. The inversion method introduced here exhibits its convenience in obtaining the sputtering distribution of the target and efficiency in coating iterations during process development. PMID:26368686

  20. High-Temperature Compressive Properties of TiC-Added Mo-Si-B Alloys

    NASA Astrophysics Data System (ADS)

    Yoshimi, Kyosuke; Nakamura, Junya; Kanekon, Daiki; Yamamoto, Shiho; Maruyama, Kouichi; Katsui, Hirokazu; Goto, Takashi

    2014-09-01

    High-temperature compressive properties of two TiC-added Mo-Si-B alloys with nominal compositions of Mo-5Si-10B-7.5TiC (70Mo alloy) and Mo-6.7Si-13.3B-7.5TiC (65Mo alloy) (at.%) were investigated. The alloys were composed of four constituent phases: Mo solid solution (Moss), Mo5SiB2, (Mo,Ti)C, and (Mo,Ti)2C. The primary phases of the 70Mo and 65Mo alloys were Moss and T2, respectively. The compressive deformability of the 65Mo alloy was significantly limited even at 1600°C because of the elongated, coarse primary T2 phase, whereas the 70Mo alloy had good compressive deformability and a high strength in the test-temperature range of 1000-1600°C; the peak stresses were 1800 MPa at 1000°C, 1230 MPa at 1200°C, and 350 MPa at 1600°C. At and above 1200°C, the peak stress values were more than double those of Mo-6.7Si-7.9B, Ti-Zr-Mo, and Mo-Hf-C alloys. The plastic strain in the 70Mo alloy at temperatures lower than the ductile-brittle transition temperature of T2 was generated by plastic deformation of not only Moss but also of (Mo,Ti)C and (Mo,Ti)2C. This work indicates that (Mo,Ti)C and (Mo,Ti)2C play an important role in determining the high-temperature strength and deformation properties of TiC-added Mo-Si-B alloys.

  1. Inductively coupled plasma etch of DUV MoSi photomasks: a designed study of etch chemistries and process results

    NASA Astrophysics Data System (ADS)

    Constantine, Chris; Johnson, David J.; Westerman, Russell J.; Hourd, Andrew C.

    1998-12-01

    The continuing requirements for high resolution, critical dimension control and linearity on photomasks necessitates highly anisotropic and uniform etching of the absorber material. Plasma etching has seen strong increases in popularity to improve the above mentioned requirements. Also recently popular is the inclusion of Embedded Phase Shift materials such as Molybdenum Silicide (MoSi); these materials allow for an engineered 180 degree shift in the phase of the exposure light at the wafer pane, affording enhanced contrast at the edges of a line or feature. This article studies the effect of ICP-based plasma conditions on the CD Uniformity, MoSi etch rate and post-etch Quartz roughness of 6 X 6 DUV MoSi Embedded Phase Shift mask structures through use of carefully Designed Experiments. This Design of Experiment (DOE) makes it possible to screen plasma chemistry, optimize resultant plasma parameters and present an overlayed Simultaneous Solution which is used as a centerpoint for Device Plate etch tuning. The high plasma density, independent ion energy control and low pressure operation of Inductively Coupled Plasmas make this technology well suited to minimizing undercut of the MoSi and affords a vehicle for the realization of a zero-basis etch process.

  2. Development of Mo(Si,Al)2-base oxidation-resistant coating on Nb-base structural materials

    NASA Astrophysics Data System (ADS)

    Tabaru, Tatsuo; Kim, Jin-Hak; Shobu, Kazuhisa; Sakamoto, Michiru; Hirai, Hisatoshi; Hanada, Shuji

    2005-03-01

    Mo(Si,Al)2-base oxidation-resistant coatings for Nb-base structural materials have been studied. The coating is composed of a Mo(Si,Al)2-base Al reservoir and Al2O3 interlayer to suppress interface reactions between the Al reservoir and the substrate. To develop a suitable Al-reservoir material, some Mo(Si0.6,Al0.4)2-HfB2 composites were prepared. Their oxidation resistance and coefficients of thermal expansion were investigated, in addition to their chemical reactivity with the Nb substrate at high temperatures. As a result, Mo(Si0.6,Al0.4)2-20 vol pct HfB2 was selected as one of the satisfactory Al reservoirs. The introduction of a stable Al2O3 interlayer was attempted using a novel powder metallurgical process to overlay the Nb substrates with the Al reservoir, where the Nb substrates were subjected to a slight surface oxidation prior to the coating process. The Nb specimens, which are thoroughly coated with the Al reservoir and Al2O3 interlayer, can be successfully fabricated by this method. The coated Nb specimens are not damaged at all after prolonged exposure in flowing Ar-20 pct O2 at 1673 K for 120 hours. Furthermore, the Al2O3 interlayer is very effective and no reactions occur at the interface. Thus, this Mo(Si,Al)2-base oxidation-resistant coating is applicable to Nb. The utility of the coating system is also confirmed for a NbSS/Nb5Si3 composite.

  3. Rapid synthesis of MoSi2-Si3N4 nanocomposite via reaction milling of Si and Mo powder mixture

    NASA Astrophysics Data System (ADS)

    Abdellahi, Majid; Amereh, Alireza; Bahmanpou, Hamed; Sharafati, Behzad

    2013-11-01

    The nanocomposite of MoSi2-Si3N4 (molybdenum disilicide-silicon nitride) was synthesized by reaction milling of the Mo and Si powder mixture. Changing the processing parameters led to the formation of different products such as α- and β-MoSi2, Si3N4, Mo2N, and Mo5Si3 at various milling times. A thermodynamic appraisal showed that the milling of Mo32Si68 powder mixture was associated with highly exothermic mechanically induced self-sustaining reaction (MSR) between Mo and Si. The MSR took place around 5 h of milling led to the formation of α-MoSi2 and the reaction between Si and N2 to produce Si3N4 under a nitrogen pressure of 1 MPa. By increasing the nitrogen pressure to 5 MPa, more heat is released, resulting in the dissociation of Si3N4 and the transformation of α-MoSi2 to β-MoSi2. Heat treatment was also performed on the milled samples and led to the formation of Mo2N and the transformation of α-MoSi2 to β-MoSi2 at the milling times of 10 and 40 h, respectively.

  4. Synthesis and analysis of Mo-Si-B based coatings for high temperature oxidation protection of ceramic materials

    NASA Astrophysics Data System (ADS)

    Ritt, Patrick J.

    The use of Ni-based superalloys in turbine engines has all but been exhausted, with operating temperatures nearing the melting point of these materials. The use of ceramics in turbine engines, particularly ceramic matrix composites such as SiC/C and SiC/SiC, is of interest due to their low density and attractive mechanical properties at elevated temperatures. The same materials are also in consideration for leading edges on hypersonic vehicles. However, SiC-based composites degrade in high temperature environments with low partial pressures of oxygen due to active oxidation, as well as high temperature environments containing water or sand. The need for a protective external coating for SiC-based composites in service is obvious. To date, no coating investigated for SiC/C or SiC/SiC has been proven to be resistant to oxidation and corrosion at intermediate and high temperatures, as well as in environments deficient in oxygen. The Mo-Si-B coating shows great promise in this area, having been proven resistant to attack from oxidation at extreme temperatures, from water vapor and from calcia-magnesia-aluminosilicate (CMAS). The adaptation of the Mo-Si-B coating for ceramic materials is presented in detail here. Evaluation of the coating under a range of oxidation conditions as well as simulated re-entry conditions confirms the efficacy of the Mo-Si-B based coating as protection from catastrophic failure. The key to the oxidation and corrosion resistance is a robust external aluminoborosilica glass layer that forms and flows quickly to cover the substrate, even under the extreme simulated re-entry conditions. Suppression of active oxidation of SiC, which may occur during atmospheric re-entry and hypersonic flight trajectories, has also been examined. In order to adapt the Mo-Si-B based coating to low partial pressures of oxygen and elevated temperatures, controlled amounts of Al were added to the Mo-Si-B based coating. The resulting coating decreased the inward

  5. Development and Characterization of SiC)/ MoSi2-Si3N4(p) Hybrid Composites

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G.

    1998-01-01

    Intermetallic compound MoSi2 has long been known as a high temperature material that has excellent oxidation resistance and electrical/thermal conductivity. Also its low cost, high melting point (2023 C), relatively low density (6.2 g/cu cm versus 9 g/cu cm for current engine materials), and ease of machining, make it an attractive structural material. However, the use of MoSi2 has been hindered due to its poor toughness at low temperatures, poor creep resistance at high temperatures, and accelerated oxidation (also known as 'pest' oxidation) at temperatures between approximately 450 and 550 C. Continuous fiber reinforcing is very effective means of improving both toughness and strength. Unfortunately, MoSi2 has a relatively high coefficient of thermal expansion (CTE) compared to potential reinforcing fibers such as SiC. The large CTE mismatch between the fiber and the matrix resulted in severe matrix cracking during thermal cycling. Addition of about 30 to 50 vol % of Si3N4 particulate to MoSi2 improved resistance to low temperature accelerated oxidation by forming a Si2ON2 protective scale and thereby eliminating catastrophic 'pest failure'. The Si3N4 addition also improved the high temperature creep strength by nearly five orders of magnitude, doubled the room temperature toughness and significantly lowered the CTE of the MoSi2 and eliminated matrix cracking in SCS-6 reinforced composites even after thermal cycling. The SCS-6 fiber reinforcement improved the room temperature fracture toughness by seven times and impact resistance by five times. The composite exhibited excellent strength and toughness improvement up to 1400 C. More recently, tape casting was adopted as the preferred processing of MoSi2-base composites for improved fiber spacing, ability to use small diameter fibers, and for lower cost. Good strength and toughness values were also obtained with fine diameter Hi-Nicalon tow fibers. This hybrid composite remains competitive with ceramic matrix

  6. Rapid Solidification Behavior of Fe-Cr-Mn-Mo-Si-C Alloys

    NASA Astrophysics Data System (ADS)

    Ranganathan, Sathees; Makaya, Advenit; Fredriksson, Hasse; Savage, Steven

    2007-12-01

    The rapid solidification behavior of alloys in the Fe-Cr-Mn-Mo-Si-C system was investigated for different compositions and cooling rates. The C content was varied and alloying additions of Mo and B were studied with respect to their effect on the microstructure. The alloys were cast as either melt-spun ribbons or as 1-mm-thick plates after levitation or as rods 2 to 4 mm in diameter by injection into copper molds. A homogeneous single-phase structure was obtained for the alloy of composition 72.8Fe-8Cr-6Mn-5Si-5Mo-3.2C (wt pct), for a sample diameter of 2.85 mm, at a cooling rate of ≈1100 K/s. The single-phase structure was identified as a metastable solid solution, exhibiting the characteristics of the ɛ phase. Upon reheating, decomposition of the single-phase structure into fine bainite plates and secondary carbides was observed between 600 °C and 700 °C. The annealed structure obtained showed high hardness values (>850 HV).

  7. Role of Microstructure in Promoting Fracture and Fatigue Resistance in Mo-Si-B Alloys

    SciTech Connect

    Schneibel, Joachim H

    2005-04-01

    An investigation of how microstructural features affect the fracture and fatigue properties of a promising class of high temperature Mo-Si-B based alloys is presented. Fracture toughness and fatigue-crack growth properties are measured at 25 and 1300 C for five Mo-Mo{sub 3}Si-Mo{sub 5}SiB{sub 2} containing alloys produced by powder metallurgy with {alpha}-Mo matrices. Results are compared with previous studies on intermetallic-matrix microstructures in alloys with similar compositions. It is found that increasing the {alpha}-Mo phase volume fraction (17-49%) or ductility (by increasing the temperature) benefits the fracture resistance; in addition, {alpha}-Mo matrix materials show significant improvements over intermetallic-matrix alloys. Fatigue thresholds were also increased with increasing {alpha}-Mo phase content, until a transition to more ductile fatigue behavior occurred with large amounts of {alpha}-Mo phase (49%) and ductility (i.e., at 1300 C). The beneficial role of such microstructural variables are attributed to the promotion of the observed toughening mechanisms of crack trapping and bridging by the relatively ductile {alpha}-Mo phase.

  8. Growth of Oriented C11(b) MoSi(2) Bicrystals Using a Modified Czochralski Technique

    SciTech Connect

    Chu, F.; Garrett, J.D.; McClellan, K.J.; Michael J.R.; Mitchell, T.E.; Peralta, P.

    1999-06-02

    Oriented bicrystals of pure C11b MoSi2 have been grown in a tri-arc furnace using the Czochralski technique. Two single crystal seeds were used to initiate the growth. Each seed had the orientation intended for one of the grains of the bicrystals, which resulted in a 60° twist boundary on the (110) plane. Seeds were attached to a water-cooled seed rod, which was pulled at 120 mm/h with the seed rod rotating at 45 rpm. The water- cooled copper hearth was counter-rotated at 160 rpm. Asymmetric growth ridges associated with each seed crystal were observed during growth and confirmed the existence of a bicrystal. It was also found that careful alignment of the seeds was needed to keep the grain boundary from growing out of the boule. The resulting boundary was characterized by imaging and crystallographic techniques in a scanning electron microscope. The boundary was found to be fairly sharp and the misorientation between the grains remained within 2° from the disorientation between the seeds.

  9. ESCA study of [open quotes]model[close quotes] allyl-based Mo/SiO[sub 2] catalysts

    SciTech Connect

    Aigler, J.M.; Brito, J.L.; Leach, P.A.; Houalla, M.; Proctor, A.; Cooper, N.J.; Hall, W.K.; Hercules, D.M. )

    1993-05-27

    Stoichiometric redox measurements and X-ray photoelectron spectroscopy (XPS or ESCA) studies were performed on an allyl-based Mo/SiO[sub 2] catalyst (1.7 wt % Mo) obtained by the sublimation of Mo([eta][sup 3]-C[sub 3]H[sub 5])[sub 4] onto SiO[sub 2] at 40 [degrees]C. The average oxidation state estimated from stoichiometric measurements correlated well with those reported in the literature. ESCA results indicated that reduction of the Mo/SiO[sub 2] catalyst at 550 [degrees]C primarily led to the formation of Mo[sup 2+]. Also, the results were consistent the reported reversibility of the redox cycle. However, the reported formation of discrete Mo[sup 4+] by oxidation of the reduced catalyst at room temperature could not be substantiated. 17 refs., 4 figs., 2 tabs.

  10. Composition and temperature dependences of site occupation for Al, Cr, W, and Nb in MoSi2

    NASA Astrophysics Data System (ADS)

    Li, Xiao-Ping; Sun, Shun-Ping; Yu, Yun; Wang, Hong-Jin; Jiang, Yong; Yi, Dan-Qing

    2015-12-01

    The composition and temperature dependences of site occupation for Al, Cr, W, and Nb in MoSi2 are investigated by using a thermodynamics model and first principles calculations. A simple parameter measuring the substitution energy difference between Si and Mo sites reflects the nature of site occupancy. At 0 K, these elements prefer Si sites in Mo-rich and Mo sites in Si-rich, and show no site preference in stoichiometric MoSi2. At elevated temperature, the site occupation behaviors show strong dependence on both composition and temperature. Some calculated results have been certified in previous experiments. Project supported by the National Natural Science Foundation of China (Grant No. 51401093) and the Natural Science Foundation of Jiangsu Province, China (Grant No. BK20130233).

  11. Pest resistant MoSi2-based materials containing in-situ grown .beta.-Si3N4whiskers

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G. (Inventor)

    2001-01-01

    A MoSi.sub.2 pest resistant material includes in-situ grown .beta.-Si.sub.3 N.sub.4 whiskers. In addition to excellent pest resistance, the material provides a lower coefficient of thermal expansion for better match with continuous reinforcing fibers such as SiC fibers. A two stage heating and pressing production technique enables lower temperature processing with substantially full densification.

  12. Pest resistant MoSi2-based materials containing in-situ grown .beta.-Si3N4 whiskers

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G. (Inventor)

    2002-01-01

    A MoSi.sub.2 pest resistant material includes in-situ grown .beta.-Si.sub.3 N.sub.4 whiskers. In addition to excellent pest resistance, the material provides a lower coefficient of thermal expansion for better match with continuous reinforcing fibers such as SiC fibers. A two stage heating and pressing production technique enables lower temperature processing with substantially full densification.

  13. Optical design and co-sputtering preparation of high performance Mo-SiO2 cermet solar selective absorbing coating

    NASA Astrophysics Data System (ADS)

    Zheng, Liqing; Gao, Fangyuan; Zhao, Shuxi; Zhou, Fuyun; Nshimiyimana, Jean Pierre; Diao, Xungang

    2013-09-01

    In order to optimize and prepare high performance Mo-SiO2 cermet solar selective absorbing coating, a series of Mo-SiO2 cermet films with different metal volume fraction were deposited on optical glass using mid-frequency (MF) and radio frequency (RF) co-sputtering. The reflectance (R) and transmittance (T) in the wavelength range of 250-2500 nm have been simulated using SCOUT software with different dielectric function models. The optical constants, film thickness, metal volume fraction and other parameters have been deduced from the modeling. The fitted optical constants were then used to simulate and optimize the Mo-SiO2 solar selective coating and samples were prepared based on the optimized parameters. The Maxwell Garnett (MG) and Bruggeman (BR) effective-medium theory have been added in the dielectric function models to describe low metal volume fraction cermet layer (LMVF) and high metal volume fraction cermet layer (HMVF), separately. The optical spectra (R and T) of all single films were in a good agreement with the fitted spectra by dielectric function models. The experimental measured reflectance of the solar selective coating was also in rather good agreement with the optimized result. The solar absorptance of theoretically optimized selective coating was 0.945, while the absorptance of the experimental coating was 0.95. The thermal emittance of 0.15 (at 400 °C) was obtained.

  14. Al-MoSi2 Composite Materials: Analysis of Microstructure, Sliding Wear, Solid Particle Erosion, and Aqueous Corrosion

    NASA Astrophysics Data System (ADS)

    Gousia, V.; Tsioukis, A.; Lekatou, A.; Karantzalis, A. E.

    2016-02-01

    In this effort, AMCs reinforced with new intermetallic phases, were produced through casting and compared as far as their microstructure, sliding wear, solid particle erosion, and aqueous corrosion response. Casting was selected as a production method based on the concept: (a) ease-to-handle and low cost production route and (b) optimum homogeneity of the reinforcing phase distribution. The MoSi2 phase was produced through vacuum arc melting and the resulting drops were milled for 30 h to produce fine powder, the characteristics of which were ascertained through SEM-EDS and XRD analysis. MoSi2 was used as precursor source for the final reinforcing phase. The powder material was incorporated in molten Al1050 alloy to additions of 2, 5 and 10 vol.% respectively. Extensive reactivity between the molten Al and the MoSi2 particles was observed, leading to the formation of new reinforcing phases mainly of the Al-Mo system. In all cases, a uniform particle distribution was observed, mainly characterized by isolated intermetallic phases and few intermetallic phase clusters. Sliding wear showed a beneficial action of the reinforcing phase on the wear of the composites. Surface oxidation, plastic deformation, crack formation, and debris abrasive action were the main degradation features. The results of solid particle erosion showed that the mechanism is different as the impact angle and the vol.% change. Regarding the corrosion, the analysis revealed localized corrosion effects. The composite behavior was not altered significantly compared to that of the monolithic matrix.

  15. High-Temperature Creep and Oxidation Behavior of Mo-Si-B Alloys with High Ti Contents

    NASA Astrophysics Data System (ADS)

    Schliephake, Daniel; Azim, Maria; von Klinski-Wetzel, Katharina; Gorr, Bronislava; Christ, Hans-Jürgen; Bei, Hongbin; George, Easo P.; Heilmaier, Martin

    2013-08-01

    Multiphase alloys in the Mo-Si-B system are potential high-temperature structural materials due to their good oxidation and creep resistance. Since they suffer from relatively high densities, the current study focuses on the influence of density-reducing Ti additions on creep and oxidation behavior at temperatures above 1273 K (1000 °C). Two alloys with compositions of Mo-12.5Si-8.5B-27.5Ti and Mo-9Si-8B-29Ti (in at. pct) were synthesized by arc melting and then homogenized by annealing in vacuum for 150 hours at 1873 K (1600 °C). Both alloys show similar creep behavior at stresses of 100 to 300 MPa and temperatures of 1473 K and 1573 K (1200 °C and 1300 °C), although they possess different intermetallic volume fractions. They exhibit superior creep resistance and lower density than a state-of-the-art Ni-base superalloy (single-crystalline CMSX-4) as well as other Mo-Si-B alloys. Solid solution strengthening due to Ti was confirmed by Vickers hardness measurements and is believed to be the reason for the significant increase in creep resistance compared to Mo-Si-B alloys without Ti, but with comparable microstructural length scales. The addition of Ti degrades oxidation resistance relative to a Mo-9Si-8B reference alloy due to the formation of a relatively porous duplex layer with titania matrix enabling easy inward diffusion of oxygen.

  16. Creep behavior of MoSi{sub 2} with Si{sub 3}N{sub 4} reinforcements

    SciTech Connect

    Feng, C.R.; Sadananda, K.

    1997-12-31

    Because of its high melting point, excellent oxidation resistance and ductility at high temperatures, MoSi{sub 2} and its composites are attractive for elevated temperature applications. In this study, the compression creep behavior of hot pressed MoSi{sub 2} with various volume fraction of Si{sub 3}N{sub 4} at 1200 C, 1300 C and 1400 C were investigated. Within the stress range of 115--425MPa, the stress exponent, n, was either 1 or 5 depended on the volume fraction of Si{sub 3}N{sub 4}. The activation energy of creep for MoSi{sub 2}-50%Si{sub 3}N{sub 4} composite was 750kJ/mol. At still higher volume fraction of Si{sub 3}N{sub 4}, the activation energy decreases to 693kJ/mol, which is the same as that for monolithic Si{sub 3}N{sub 4}.

  17. Investigation of the silicon loss in APS MoSi{sub 2} under the range of typical spray conditions

    SciTech Connect

    Hollis, K.J.; Castro, R.G.; Bartlett, A.; Neiser, R.

    1996-09-01

    MoSi{sub 2} provides good high temperature oxidation and corrosion resistance. However, the lower silicides such as Mo{sub 5}Si{sub 3} do not provide such resistance. In this study, air plasma sprayed (APS) MoSi{sub 2} particle temperatures and velocities were measured under various torch conditions chosen to span the majority of typically utilized spray parameters. Empirical models of particle temperature and velocity were computed from the data. Three spray conditions were chosen to produce high, medium and low particle temperature and velocities. Coatings produced under these spray conditions were characterized by profile tracing, quantitative x-ray diffraction, and SEM analysis. The Mo{sub 5}Si{sub 3} level in the coatings ranged from 5% to 8% while the Mo{sub 5}Si{sub 3} level in the starting powder was 0.6%. Particle size, particle trajectory, and torch parameters were found to be important factors in the Si loss process when APS depositing MoSi{sub 2}.

  18. Development of Thermal Barrier Coating System with Superior Thermal Cyclic Properties with an Intermediate Layer Containing MoSi2

    NASA Astrophysics Data System (ADS)

    Sonoya, Keiji; Tobe, Shogo

    The authors have developed a method of improving the thermal cyclic resistance of the thermal barrier coating system that is deposited on gas turbine components. A conventional thermal barrier coating consists of a duplex system: a top coating and a bond coating. The developed system has a protective intermediate layer of MoSi2 which prevents oxidation of the bond coating. The conventional duplex plasma -sprayed coating was delaminated after 20 thermal cycles. On the other hand, the developed triple-layered coating system was not delaminated after 60 cycles. The reason for the enhanced resistance to thermal cycles of the developed triple-layered coating system is that the MoSi2 layer between the top coating and the bond coating has a self-repairing property. MoSi2 oxidizes to form SiO2, which seals the cracks and pores formed between the top coating and the bond coating. Thus, the formation of a thermally grown oxide(TGO), which causes the delamination of the coating, is prevented and the thermal cyclic resistance is improved.

  19. Development and Oxidation Resistance of Plasma Sprayed Mo(Si,Al)2 Coating on Nbss/Nb5Si3 in Situ Composites

    NASA Astrophysics Data System (ADS)

    Yao, Dendzun; Wei, Haixia; Zhou, Chungen

    A Mo(Si,Al)2 coating is developed to protect Nbss/Nb5Si3 in situ composite by plasma spraying. The binary layers of this coating consist of an inner interdiffusion layer surrounded by Mo(Si,Al)2 layer with C40 crystal structure. After oxidation at 1250°C for 100h, Mo(Si,Al)2 coating exhibited an excellent protection against oxidation and good adherence to substrate. The oxidation curve followed parabolic law and even after oxidation at high temperature for 100h, the weight gain per unit area of Mo(Si,Al)2 coating is 8.24mg/cm2. No evident spalling of coating to substrate was observed but a continuous and compact layer of Al2O3 was formed on coating surface to prevent oxidation below coating and substrate.

  20. Bias-polarity-dependent resistance switching in W/SiO2/Pt and W/SiO2/Si/Pt structures

    PubMed Central

    Jiang, Hao; Li, Xiang Yuan; Chen, Ran; Shao, Xing Long; Yoon, Jung Ho; Hu, Xiwen; Hwang, Cheol Seong; Zhao, Jinshi

    2016-01-01

    SiO2 is the most significantly used insulator layer in semiconductor devices. Its functionality was recently extended to resistance switching random access memory, where the defective SiO2 played an active role as the resistance switching (RS) layer. In this report, the bias-polarity-dependent RS behaviours in the top electrode W-sputtered SiO2-bottom electrode Pt (W/SiO2/Pt) structure were examined based on the current-voltage (I-V) sweep. When the memory cell was electroformed with a negative bias applied to the W electrode, the memory cell showed a typical electronic switching mechanism with a resistance ratio of ~100 and high reliability. For electroforming with opposite bias polarity, typical ionic-defect-mediated (conducting filament) RS was observed with lower reliability. Such distinctive RS mechanisms depending on the electroforming-bias polarity could be further confirmed using the light illumination study. Devices with similar electrode structures with a thin intervening Si layer between the SiO2 and Pt electrode, to improve the RS film morphology (root-mean-squared roughness of ~1.7 nm), were also fabricated. Their RS performances were almost identical to that of the single-layer SiO2 sample with very high roughness (root-mean-squared roughness of ~10 nm), suggesting that the reported RS behaviours were inherent to the material property. PMID:26916050

  1. Bias-polarity-dependent resistance switching in W/SiO2/Pt and W/SiO2/Si/Pt structures

    NASA Astrophysics Data System (ADS)

    Jiang, Hao; Li, Xiang Yuan; Chen, Ran; Shao, Xing Long; Yoon, Jung Ho; Hu, Xiwen; Hwang, Cheol Seong; Zhao, Jinshi

    2016-02-01

    SiO2 is the most significantly used insulator layer in semiconductor devices. Its functionality was recently extended to resistance switching random access memory, where the defective SiO2 played an active role as the resistance switching (RS) layer. In this report, the bias-polarity-dependent RS behaviours in the top electrode W-sputtered SiO2-bottom electrode Pt (W/SiO2/Pt) structure were examined based on the current-voltage (I-V) sweep. When the memory cell was electroformed with a negative bias applied to the W electrode, the memory cell showed a typical electronic switching mechanism with a resistance ratio of ~100 and high reliability. For electroforming with opposite bias polarity, typical ionic-defect-mediated (conducting filament) RS was observed with lower reliability. Such distinctive RS mechanisms depending on the electroforming-bias polarity could be further confirmed using the light illumination study. Devices with similar electrode structures with a thin intervening Si layer between the SiO2 and Pt electrode, to improve the RS film morphology (root-mean-squared roughness of ~1.7 nm), were also fabricated. Their RS performances were almost identical to that of the single-layer SiO2 sample with very high roughness (root-mean-squared roughness of ~10 nm), suggesting that the reported RS behaviours were inherent to the material property.

  2. ZrO sub 2 and ZrO sub 2 /SiC particle reinforced-MoSi sub 2 matrix composites

    SciTech Connect

    Petrovic, J.J.; Bhattacharya, A.K.; Honnell, R.E.; Mitchell, T.E. ); Wade, R.K. ); McCellan, K.J. . Dept. of Materials Science and Engineering)

    1991-01-01

    ZrO{sub 2}-MoSi{sub 2} and ZrO{sub 2}/SiC-MoSi{sub 2} composites were fabricated by hot pressing and hot pressing/HIP at 1700{degrees}C. No reactions between ZrO{sub 2}, SiC, and MoSi{sub 2} were observed. An amorphous silica glassy phase was present in all composites. Composites with unstabilized ZrO{sub 2} particles exhibited the highest room temperature fracture toughness, reaching a level three times that of pure MoSi{sub 2}. Both the room temperature toughness and 1200{degrees}C strength of ZrO/{sub 2}SiC-MoSi{sub 2} composites were higher than ZrO{sub 2}-MoSi{sub 2} composites, indicating beneficial effects of combined reinforcement phases. Low strength levels were observed at 1400{degrees}C due to the presence of the silica glassy phase. Elimination of glassy phases and refinements in microstructural homogeneity are processing routes important to the optimization of the mechanical properties of these types of composites. 18 refs., 7 figs.

  3. Development of Tough, Strong, and Pest-Resistant MoSi2-(Beta)Si3N4 Composites for High-Temperature Structural Applications

    NASA Technical Reports Server (NTRS)

    Hebsur, M. G.; Choi, S. R.; Whittenberger, J. D.; Salem, J. A.; Noebe, R. D.

    2001-01-01

    A new MoSi2-base composite was developed that contains in-situ reinforcement of whisker-type beta-Si3N4 grains in a MoSi2 matrix. The advantages of this in-situ reinforced MoSi2-Si3N4 are lower density, higher fracture toughness and better strength than typical MoSi2 alloys, combined with excellent environmental and pest resistance. The average fracture toughness of the in-situ reinforced material determined by one technique was 12.2 MPa.m(exp 1/2) compared to 4.9 to 5.5 MPa.m(exp 1/2) for similar materials with the exception that the beta-Si3N4 had a blocky morphology as opposed to the whisker-like morphology typical of the in-situ toughened material. This MoSi2-(beta)Si3N4 was also resistant to pesting at intermediate temperatures (400 to 600 C) even when precracked or under applied load; conditions that would quickly reduce typical MoSi2 alloys to oxidized powder.

  4. Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering

    NASA Astrophysics Data System (ADS)

    Voronov, D. L.; Gawlitza, P.; Cambie, R.; Dhuey, S.; Gullikson, E. M.; Warwick, T.; Braun, S.; Yashchuk, V. V.; Padmore, H. A.

    2012-05-01

    Deposition of multilayers on saw-tooth substrates is a key step in the fabrication of multilayer blazed gratings (MBG) for extreme ultraviolet and soft x-rays. Growth of the multilayers can be perturbed by shadowing effects caused by the highly corrugated surface of the substrates, which results in distortion of the multilayer stack structure and degradation of performance of MBGs. To minimize the shadowing effects, we used an ion-beam sputtering machine with a highly collimated atomic flux to deposit Mo/Si multilayers on saw-tooth substrates. The sputtering conditions were optimized by finding a balance between smoothening and roughening processes in order to minimize degradation of the groove profile in the course of deposition and at the same time to keep the interfaces of a multilayer stack smooth enough for high efficiency. An optimal value of energy of 200 eV for sputtering Kr+ ions was found by deposition of test multilayers on flat substrates at a range of ion energies. Two saw-tooth substrates were deposited at energies of 200 eV and 700 eV for the sputtering ions. It was found that reduction of the ion energy improved the blazing performance of the MBG and resulted in a 40% gain in the diffraction efficiency due to better replication of the groove profile by the multilayer. As a result of the optimization performed, an absolute diffraction efficiency of 28.8% was achieved for the 2nd blaze order of the MBG with a groove density of 7350 lines/mm at a wavelength of 13.5 nm. Details of the growth behavior of the multilayers on flat and saw-tooth substrates are discussed in terms of the linear continuous model of film growth.

  5. Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering

    SciTech Connect

    Gawlitza, Peter; Cambie, Rossana; Dhuey, Scott; Gullikson, Eric; Warwick, Tony; Braun, Stefan; Yashchuk, Valeriy; Padmore, Howard

    2012-01-23

    Deposition of multilayers on saw-tooth substrates is a key step in the fabrication of multilayer blazed gratings (MBG) for extreme ultraviolet and soft x-rays. Growth of the multilayers can be perturbed by shadowing effects caused by the highly corrugated surface of the substrates, which results in distortion of the multilayer stack structure and degradation of performance of MBGs. To minimize the shadowing effects we used an ionbeam sputtering machine with a highly collimated atomic flux to deposit Mo/Si multilayers on saw-tooth substrates. The sputtering conditions were optimized by finding a balance between smoothening and roughening processes in order to minimize degradation of the groove profile in the course of deposition and at the same time to keep the interfaces of a multilayer stack smooth enough for high efficiency. An optimal value of energy of 200 eV for sputtering Kr{sup +} ions was found by deposition of test multilayers on flat substrates at a range of ion energies. Two saw-tooth substrates were deposited at energies of 200 eV and 700 eV for the sputtering ions. It was found that reduction of the ion energy improved the blazing performance of the MBG and resulted in a 40% gain in the diffraction efficiency due to better replication of the groove profile by the multilayer. As a result of the optimization performed, an absolute diffraction efficiency of 28.8% was achieved for the 2nd blaze order of the MBG with a groove density of 7350 lines/mm at a wavelength of 13.5 nm. Details of the growth behavior of the multilayers on flat and saw-tooth substrates are discussed in terms of the Linear Continuous Model of film growth.

  6. Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering

    SciTech Connect

    Voronov, D. L.; Cambie, R.; Dhuey, S.; Gullikson, E. M.; Warwick, T.; Yashchuk, V. V.; Padmore, H. A.; Gawlitza, P.; Braun, S.

    2012-05-01

    Deposition of multilayers on saw-tooth substrates is a key step in the fabrication of multilayer blazed gratings (MBG) for extreme ultraviolet and soft x-rays. Growth of the multilayers can be perturbed by shadowing effects caused by the highly corrugated surface of the substrates, which results in distortion of the multilayer stack structure and degradation of performance of MBGs. To minimize the shadowing effects, we used an ion-beam sputtering machine with a highly collimated atomic flux to deposit Mo/Si multilayers on saw-tooth substrates. The sputtering conditions were optimized by finding a balance between smoothening and roughening processes in order to minimize degradation of the groove profile in the course of deposition and at the same time to keep the interfaces of a multilayer stack smooth enough for high efficiency. An optimal value of energy of 200 eV for sputtering Kr{sup +} ions was found by deposition of test multilayers on flat substrates at a range of ion energies. Two saw-tooth substrates were deposited at energies of 200 eV and 700 eV for the sputtering ions. It was found that reduction of the ion energy improved the blazing performance of the MBG and resulted in a 40% gain in the diffraction efficiency due to better replication of the groove profile by the multilayer. As a result of the optimization performed, an absolute diffraction efficiency of 28.8% was achieved for the 2nd blaze order of the MBG with a groove density of 7350 lines/mm at a wavelength of 13.5 nm. Details of the growth behavior of the multilayers on flat and saw-tooth substrates are discussed in terms of the linear continuous model of film growth.

  7. Behavior of W-SiC/SiC dual layer tiles under LHD plasma exposure

    NASA Astrophysics Data System (ADS)

    Mohrez, Waleed A.; Kishimoto, Hirotatsu; Kohno, Yutaka; Hirotaki, S.; Kohyama, Akira

    2013-11-01

    Towards the early realization of fusion power reactors, high performance first wall and plasma facing components (PFCs) are essentially required. As one of the biggest challenges for this, high heat flux component (HHFC) design and R & D has been emphasized. This report provides the high performance HHFC materials R & D status and the first plasma exposure test result from large helical device (LHD). W-SiC/SiC dual layer tiles (hereafter, W-SiC/SiC) were developed by applied NITE process. This is the realistic concept of tungsten armor with ceramic composite substrates for fusion power reactors. The dual layer tiles were fabricated and tested their survival under the LHD divertor plasma exposure (Nominally 10 MW/m2 maximum heat load for 6 s operation cycle). The microstructure evolution, including crack and pore formation, was analyzed, besides the behavior of bonding layer between tungsten and SiC/SiC was evaluated by C-scanning images of ultrasonic method and Electron probe Micro-analyzer (EPMA). Thermal analysis was conducted by finite element method, where ANSYS code release 13.0 was used.

  8. Schottky Barrier mapping of the W/Si diode using ballistic electron emission microscopy

    NASA Astrophysics Data System (ADS)

    Durcan, Christopher; Balsano, Robert; Pieniazek, Nicholas; Labella, Vincent

    2015-03-01

    The Schottky barrier of the W/Si(001) diode was investigated and spatially mapped at the nanoscale using ballistic electron emission microscopy (BEEM) and ballistic hole emission microscopy (BHEM). The miscibility of tungsten and silicon creates a thin silicide upon deposition with transmission electron microscopy (TEM) and Rutherford backscattering spectrometry (RBS) showing the changes in the silicide over several weeks. Using standard current voltage measurements there is no change in the charge transport across the diode during this time period. However, BEEM measurements do show dramatic changes to the transport of ballistic electrons over time with nanoscale resolution. Time dependent Schottky barrier maps are generated over a 1 μm x 1 μm area and provide valuable insight to the barrier height homogeneity, defect formation, and interfacial effects occurring in the diode.

  9. A sintering model for SiC(sub)w/Si3N4 composites

    NASA Technical Reports Server (NTRS)

    Freedman, Marc R.; Kiser, James D.; Sanders, William A.

    1988-01-01

    Presented is a model which suggests that it should be possible to pressureless sinter a SiC(sub w)/ Si3N4 composite to theoretical density. Prior failure to achieve complete densification by sintering is attributed to the use of compositions which result in a glass deficit. There is one basic premise for this model. The ratio of glass amount to surface area of nonglass constituents must be the same for both composite and sinterable monolithic Si3N4. This model suggests that whisker and grain sizes and whisker loading influence the glass amount necessary for successful sintering of composites. According to the model, a large glass amount will be necessary for successful sintering of these composites. However, grain boundary thicknesses in the composite will be less than those in the analogous monolithic materials. This suggests that good high temperature strength may still be attained. A recent report supports the predictions of the model.

  10. Effects of Wet Air and Synthetic Combustion Gas Atmospheres on the Oxidation Behavior of Mo-Si-B Alloys

    SciTech Connect

    Kramer, M.J.; Thom, A.J.; Mandal, P.; Behrani, V.; Akinc, M.

    2003-04-24

    Continuing our work on understanding the oxidation behavior of multiphase composite alloys based on the Mo-Si-B system, we investigated three alloys in the Mo-Si-B system, designated as A1, A2, and A3. The nominal phase assemblages of these alloys are: A1 = Mo{sub 5}Si{sub 3}B{sub x} (T1)-MoSi{sub 2}-MoB, A2 = T1-Mo{sub 5}SiB{sub 2} (T2)-Mo{sub 3}Si, and A3 = Mo-T2-Mo{sub 3}Si. Our previous work showed that for exposures to 1100 C, all alloys formed a protective oxide scale in dry air. Exposures to wet air containing about 150 Torr water promoted the formation of a multiphase layer near the scale/alloy interface composed of Mo and MoO{sub 2}. Interrupted mass loss measurements indicated a near zero mass change. In the present study, isothermal mass measurements were conducted in order to quantitatively determine the oxidation rate constants at 1000 C in both dry and wet air. These measurements are critical for understanding the nature of scale development during the initial exposure, as well as the nature of scale stability during the long-term exposure. Isothermal measurements were also conducted at 1600 C in dry air to make an initial determination of alloy stability with respect to Vision 21 goals. We also conducted alloy oxidation testing in a synthetic oxidizing combustion atmosphere. Alloys were exposed up to 300 hours at 1100 C to a gas mixture having an approximate gas composition of N{sub 2} - 13 CO{sub 2} - 10 H{sub 2}O - 4 O{sub 2}. This gas composition simulates oxidizing flue gas, but does not contain a sulfidizing agent that would also be present in flue gas. The oxidized samples were carefully analyzed by SEM/EDS. This analysis will be discussed to provide an understanding of the role of water vapor and the synthetic combustion atmosphere on the oxidative stability of Mo-Si-B alloys.

  11. Synergistic toughening of hard, nacre-mimetic MoSi2 coatings by self-assembled hierarchical structure

    NASA Astrophysics Data System (ADS)

    Xu, Jiang; Zhao, Xiaoli; Munroe, Paul; Xie, Zonghan

    2014-02-01

    Like many other intermetallic materials, MoSi2 coatings are typically hard, but prone to catastrophic failure due to their low toughness at ambient temperature. In this paper, a self-assembled hierarchical structure that closely resembles that of nacre (i.e., mother of pearl) was developed in a MoSi2-based coating through a simple, yet cost-effective, depostion technique. The newly formed coating is tough and can withstand multiple indentations at high loads. Key design features responsible for this remarkable outcome were identified. They include a functionally graded multilayer featuring elastic modulus oscillation, varying sublayer thickness and a columnar structure that are able to attenuate stress concentrations; interlocking boundaries between adjacent sublayers that improve the bonding and arrest the cracks; a transitional layer that bridges the coating and substrate and facilitates load transfer. Moreover, the contributions of six important structural characteristics to damage resistance are quantified using finite elemnet analysis and in an additive manner (i.e., from low- to high-level complexity). The in-situ toughened coating is envisaged to enhance the mechanical performance and extend the lifespan of metal components used in safety-critical applications.

  12. Synergistic toughening of hard, nacre-mimetic MoSi2 coatings by self-assembled hierarchical structure

    PubMed Central

    Xu, Jiang; Zhao, Xiaoli; Munroe, Paul; Xie, Zonghan

    2014-01-01

    Like many other intermetallic materials, MoSi2 coatings are typically hard, but prone to catastrophic failure due to their low toughness at ambient temperature. In this paper, a self-assembled hierarchical structure that closely resembles that of nacre (i.e., mother of pearl) was developed in a MoSi2-based coating through a simple, yet cost-effective, depostion technique. The newly formed coating is tough and can withstand multiple indentations at high loads. Key design features responsible for this remarkable outcome were identified. They include a functionally graded multilayer featuring elastic modulus oscillation, varying sublayer thickness and a columnar structure that are able to attenuate stress concentrations; interlocking boundaries between adjacent sublayers that improve the bonding and arrest the cracks; a transitional layer that bridges the coating and substrate and facilitates load transfer. Moreover, the contributions of six important structural characteristics to damage resistance are quantified using finite elemnet analysis and in an additive manner (i.e., from low- to high-level complexity). The in-situ toughened coating is envisaged to enhance the mechanical performance and extend the lifespan of metal components used in safety-critical applications. PMID:24577416

  13. PLASMA SPRAYED FUNCTIONALLY GRADED AND LAYERED MoSi2-A1203 COMPOSITES FOR HIGH TEMPERATURE SENSOR SHEATH APPLICATION

    SciTech Connect

    R. VAIDYA; ET AL

    2001-01-01

    Protective sensor sheaths are required in the glass industry for sensors that are used to measure various properties of the melt. Molten glass presents an extremely corrosive elevated temperature environment, in which only a few types of materials can survive. Molybdenum disilicide (MoSi{sub 2}) has been shown to possess excellent corrosion resistance in molten glass, and is thus a candidate material for advanced sensor sheath applications. Plasma spray-forming techniques were developed to fabricate molybdenum dilicide-alumina (Al{sub 2}O{sub 3}) laminate and functionally graded composite tubes with mechanical properties suitable for sensor sheath applications. These functionally graded materials (FGMs) were achieved by manipulating the powder hoppers and plasma torch translation via in-house created computer software. Molybdenum disilicide and alumina are thermodynamically stable elevated temperature materials with closely matching thermal expansion coefficients. Proper tailoring of the microstructure of these MoSi{sub 2}-Al{sub 2}O{sub 3} composites can result in improved strength, toughness, and thermal shock resistance. This study focuses on the mechanical performance of these composite microstructures.

  14. Synergistic toughening of hard, nacre-mimetic MoSi2 coatings by self-assembled hierarchical structure.

    PubMed

    Xu, Jiang; Zhao, Xiaoli; Munroe, Paul; Xie, Zonghan

    2014-01-01

    Like many other intermetallic materials, MoSi2 coatings are typically hard, but prone to catastrophic failure due to their low toughness at ambient temperature. In this paper, a self-assembled hierarchical structure that closely resembles that of nacre (i.e., mother of pearl) was developed in a MoSi2-based coating through a simple, yet cost-effective, depostion technique. The newly formed coating is tough and can withstand multiple indentations at high loads. Key design features responsible for this remarkable outcome were identified. They include a functionally graded multilayer featuring elastic modulus oscillation, varying sublayer thickness and a columnar structure that are able to attenuate stress concentrations; interlocking boundaries between adjacent sublayers that improve the bonding and arrest the cracks; a transitional layer that bridges the coating and substrate and facilitates load transfer. Moreover, the contributions of six important structural characteristics to damage resistance are quantified using finite elemnet analysis and in an additive manner (i.e., from low- to high-level complexity). The in-situ toughened coating is envisaged to enhance the mechanical performance and extend the lifespan of metal components used in safety-critical applications. PMID:24577416

  15. Effects of voltage on microstructure and oxidation resistance of SiB6-MoSi2 coating deposited by pulse arc discharge deposition

    NASA Astrophysics Data System (ADS)

    Zhang, Yong-Liang; Huang, Jian-Feng; Zhu, Kong-Jun; Cao, Li-Yun; Li, Cui-Yan; Zhou, Lei; Zhang, Bo-Ye; Kong, Wei-Hua; Zhang, Bo

    2015-06-01

    To protect carbon/carbon (C/C) composites against oxidation, a SiB6-MoSi2 coating was prepared by pulse arc discharge deposition (PADD). The influence of deposition voltage on arc discharge sintering ability, microstructure and oxidation resistance of the SiB6-MoSi2 coatings was investigated. Results show that the oxidation resistance of the coating is improved when the voltage increases from 350 to 450 V. The dense and good crystallization SiB6-MoSi2 coating was obtained with sufficient arc discharge sintering energy when the voltage is 450 V. And the multilayer coatings can protect C/C composites from oxidation in air at 1773 K for 164 h with a weight loss of 2.04%. The evaporation of the molten glass layer and MoO3 is the main reason for the failure of the multilayer coatings.

  16. Control of surface mobility for conformal deposition of Mo-Si multilayers on saw-tooth substrates

    NASA Astrophysics Data System (ADS)

    Voronov, D. L.; Anderson, E. H.; Gullikson, E. M.; Salmassi, F.; Warwick, T.; Yashchuk, V. V.; Padmore, H. A.

    2013-11-01

    Multilayer-coated blazed gratings (MBG) are the most promising solution for ultra-high resolution soft X-ray spectroscopy, since they can have very high groove density and provide high-order operation and very high diffraction efficiency. The performance of MBGs however depends critically on the conformal deposition of the multilayer (ML) stack on a saw-tooth substrate and the minimization of roughness. We present an analysis of the roughening and smoothing processes during growth of Mo/Si multilayers deposited over a range of pressures of Ar sputtering gas on flat and saw-tooth substrates. A Linear Continuum Model (LCM) of the film growth was used to understand the interplay between smoothing and roughening of the ML films and to predict the optimum conditions for deposition. The MBG coated under the optimal deposition conditions demonstrated high diffraction efficiency in the EUV and soft X-ray wavelength ranges

  17. Use of CVD AlN films as protective coatings in MoSi{sub 2} composites

    SciTech Connect

    Cook, M.J.; Hudson, J.B.; Hillig, W.B.

    1995-10-01

    In many fiber reinforced composite systems, protective coatings on the fibers are required in order to protect the fiber from reaction with the matrix, to modify the mechanical properties of the fiber-matrix interface, or to protect the fiber during processing steps such as chemical vapor infiltration. The authors have developed techniques for coating single crystal sapphire fibers with thin AlN layers, using CVD from an organometallic precursor in a cold wall reactor. Side by side tests of coated and uncoated fibers introduced into a MoSi{sub 2} matrix, either by hot isostatic pressing or by reactive vapor infiltration (RVI), indicate that the coating inhibits both fiber-matrix interdiffusion and volatilization of the fibers by HCl produced in the RVI process.

  18. Abrasive wear behavior of a brittle matrix (MoSi2) composite reinforced with a ductile phase (Nb)

    SciTech Connect

    Alman, David E.; Hawk, Jeffrey A.

    2001-10-01

    The toughness of a variety of brittle ceramic and intermetallic matrices has been improved through the incorporation of ductile metallic reinforcements. In these composites resistance to catastrophic failure of the matrix is derived through a combination of mechanisms, including matrix crack bridging, matrix crack defection and rupturing of the ductile phase. The degree to which these mechanisms operate is a function of composite microstructure. In general, the ductile phase is softer than the matrix phase. This may have unique implications when the materials are subjected to a wear environment, whether intentional or not. Hence, it is important to understand the wear behavior of these new materials. MoSi2–Nb was selected as a model composite system, in part because of the wide body of open literature regarding this system. The influences of abrasive wear environment and the composite microstructure (Nb reinforcement size, shape and volume fraction) on the wear resistance of the composites are reported.

  19. Phase Equilibria, Microstructure, and High-Temperature Strength of TiC-Added Mo-Si-B Alloys

    NASA Astrophysics Data System (ADS)

    Miyamoto, Shimpei; Yoshimi, Kyosuke; Ha, Seong-Ho; Kaneko, Takahiro; Nakamura, Junya; Sato, Tetsuya; Maruyama, Kouichi; Tu, Rong; Goto, Takashi

    2013-05-01

    TiC was added to Mo-Si-B alloys using a conventional Ar arc-melting technique, and the phase equilibria, microstructure evolution, and high-temperature strength at 1673 K (1400 °C) were investigated. The primary phase changed to Mo solid solution (Moss), Mo5SiB2 (T2), or TiC depending on the composition. Following the primary phase solidification, a Moss + TiC, Moss + T2, or Moss + T2 + TiC + Mo2C eutectic reaction took place as the secondary solidification step. In some alloys, Moss + T2 + TiC and Moss + T2 + Mo2C eutectic reactions were present as higher-order solidification steps. After annealing at 2073 K (1800 °C) for 24 hours, Moss, T2, TiC, and Mo2C coexisted stably with microstructural coarsening. The coarsening rate was much faster in an alloy with no TiC dispersion, suggesting that TiC has a strong pinning effect on the grain boundary and interface migration. Compression tests conducted at 1673 K (1400 °C) revealed strength properties of almost all the alloys that were better than those of the Mo-Hf-C alloy (MHC). Alloy densities were 9 g/cm3 or less, which is lighter than pure Mo and MHC (≥10 g/cm3) and competitive with Ni-base superalloys. TiC-added Mo-Si-B alloys are promising candidates for ultrahigh-temperature materials beyond Ni-base superalloys.

  20. Understanding Influence of MoSi2 Addition (5 Weight Percent) on Tribological Properties of TiB2

    NASA Astrophysics Data System (ADS)

    Mukhopadhyay, Amartya; Raju, G. B.; Basu, Bikramjit

    2008-12-01

    In densifying engineering ceramics such as TiB2 using nonmetallic sinter additives, it is important to assess the influence of the addition of sinter-aid on the properties of TiB2. The present article reports how a small addition of MoSi2 (5 wt pct) sinter-aid enhances the wear resistance of TiB2 at mode-I fretting contact. This has been confirmed using a series of unlubricated wear tests on hot-pressed ceramics using two different counterbodies, viz. bearing steel and WC-6 wt pct Co cemented carbide, under identical testing conditions. Steady-state coefficient of friction (COF) against steel counterbody has been found to noticeably vary in the range of 0.5 to 1, with variation in load or MoSi2 addition. However, insignificant variation in COF (˜0.5) has been recorded during fretting against WC-Co. Furthermore, lower wear rate (˜10-6 mm3/Nm) is measured against the cemented carbide, as compared to that against steel (˜10-5 mm3/Nm). It has been observed that the material removal of TiB2-based ceramics against steel involves tribochemical wear as well as abrasive wear, and the occurrence of tribochemical wear is explained in terms of various feasible reactions at the tribological interface. Lower contact area, resulting in reduced adhesive wear, along with the absence of additional tribochemical wear, has been attributed to lower wear rate as observed after fretting against the harder (WC-Co) counterbody. A number of possible reactions along with their thermodynamic feasibility are discussed to explain the tribochemical wear at the interface of the mating couple. Irrespective of counterbody or material composition, the measured wear volume exhibits linear dependency on abrasion parameter, confirming the role of material parameters on the contribution of abrasive wear to the material removal/damage of the investigated materials.

  1. Thermal and stress studies of the 30.4 nm Mo/Si multilayer mirror for the moon-based EUV camera

    NASA Astrophysics Data System (ADS)

    Li, Yunpeng; Zhang, Hongji; Wang, Haifeng; He, Fei; Wang, Xiaodong; Liu, Yang; Han, Suli; Zheng, Xin; Wang, Xiaoduo; Chen, Bin; Li, Haibo; Chen, Bo; Cao, Jianlin

    2014-10-01

    To investigate the environmental adaptability of the Mo/Si multilayers on lunar surface, we studied the stability and stress of Mo/Si multilayers under the low and high temperature environment. The in-situ X-ray diffraction (XRD) and the ex-situ intrinsic stress are measured in the temperature range from -135 °C to 600 °C and from -190 °C to 600 °C, respectively. The results demonstrate that the periodic structure of Mo/Si multilayers is stable between -135 °C and 300 °C. The stress is unaffected under low temperature and it gradually increases from -260 MPa to 1G MPa when the temperature changes from room temperature to 600 °C. Above 600 °C, large tensile stress leads to folds and cracks in the film. Thus, the large temperature range on lunar surface has little effect on the structure, performance and stress of the Mo/Si multilayers and the high temperature in lunar day releases the stress of the multilayer mirror.

  2. Matrix grain characterisation by electron backscattering diffraction of powder metallurgy aluminum matrix composites reinforced with MoSi{sub 2} intermetallic particles

    SciTech Connect

    Corrochano, J. Hidalgo, P.; Lieblich, M.; Ibanez, J.

    2010-11-15

    Research highlights: Six extruded PM AA6061/MoSi{sub 2}/15p were processed with and without ball milling {yields} EBSD was used to characterise matrix grain size and grain orientation. {yields} Ball milling decreases matrix grain size to submicrometric level. {yields} Ball milling produces a more equiaxed microstructure and larger misorientation. {yields} Increasing milling time produces matrix texture randomization.

  3. Characterization of ion beam sputtered deposited W/Si multilayers by grazing incidence x-ray diffraction and x-ray reflectivity technique

    NASA Astrophysics Data System (ADS)

    Dhawan, Rajnish; Rai, Sanjay

    2016-05-01

    W/Si multilayers four samples have been deposited on silicon substrate using ion beam sputtering system. Thickness of tungsten (W) varies from around 10 Å to 40 Å while the silicon (Si) thickness remains constant at around 30 Å in multilayers [W-Si]x4. The samples have been characterized by grazing incidence X-ray diffraction (GIXRD) and X-ray reflectivity technique (XRR). GIXRD study shows the crystalline behaviour of W/Si multilayer by varying W thickness and it is found that above 20 Å the W film transform from amorphous to crystalline phase and X-ray reflectivity data shows that the roughnesses of W increases on increasing the W thicknesses in W/Si multilayers.

  4. Calibration of CD mask standards for the 65-nm node: CoG and MoSi

    NASA Astrophysics Data System (ADS)

    Richter, J.; Heins, T.; Liebe, R.; Bodermann, B.; Diener, A.; Bergmann, D.; Frase, C. G.; Bosse, H.

    2007-02-01

    We report on the traceable calibration of linewidth (CD) photomask standards which are used as reference standards for production masks of the 65 nm node. Two different types of masks with identical layout were produced and calibrated, namely a binary mask (CoG) and a half-tone phase shifting mask (193MoSi PSM). We will in particular describe the applied calibration procedures and cross-correlate the results from different high resolution metrology tools, like SEM, UV microscopy and AFM. The layout of the CD photomask standard contains isolated as well as dense line features in both tones with nominal CD down to 100 nm. Calibration of the standards was performed at PTB by UV microscopy and LV-SEM, supported by additional AFM measurements. For analysis of the measured high resolution microscopy images and the deduced profiles appropriate signal modeling was applied for every metrology tool, which allows a meaningful comparison of geometrical parameters of the measured calibration structures. By this approach, e.g. the deduced feature widths at the top of the structures and the widths at 50% height of the structures can be related to the measured edge angles. The linearity e. g. of the measured top CD on different type of structures on the CoG CD standard was determined to be below 5 nm down to line feature dimensions well below 200 nm.

  5. PROCESSING, MICROSTRUCTURE AND CREEP BEHAVIOR OF MO-SI-B-BASED INTERMETALLIC ALLOYS FOR VERY HIGH TEMPERATURE STRUCTURAL APPLICATIONS

    SciTech Connect

    Vijay K. Vasudevan

    2005-02-08

    This research project is concerned with developing a fundamental understanding of the effects of processing and microstructure on the creep behavior of refractory intermetallic alloys based on the Mo-Si-B system. During this year, the microstructure, bend strength and compressive creep behavior of a Mo-3Si-1B (in wt.%) alloy were studied. The microstructure of this alloy was three-phase, being composed of {alpha}-Mo, Mo{sub 3}Si and T2-Mo{sub 5}SiB{sub 2} phases. The elastic limit strength of the alloy remained quite high until 1200 C with a value of 800MPa, but dropped rapidly thereafter to a value of 220 MPa at 1400 C. Results of compressive creep tests at 1200 C showed that the creep rates were quite high and varied nearly linearly with stress between 250 and 500 MPa, which suggests that diffusional mechanisms dominate the creep process. Microstructural observations of post-crept samples indicated the presence of many voids in the {alpha}-Mo grains and few cracks in the intermetallic particles and along their interfaces with the {alpha}-Mo matrix. These results and presented and discussed.

  6. High damping Al-Fe-Mo-Si/Zn-Al composites produced by rapidly solidified powder metallurgy process

    SciTech Connect

    Li, P.Y.; Dai, S.L.; Chai, S.C.; Li, Y.R.

    2000-05-10

    The metallic materials commonly used in aircraft and aerospace fields, such as aluminum and titanium alloys, steels, etc., show extremely low damping capacity (usually of the order of or less than 10{sup {minus}3}). Thus, some problems related to vibration may emerge and influence the reliability, safety and life of airplanes, satellites, etc. It has been reported that almost two thirds of errors for rockets and satellites are related to vibration and noise. One effective way to solve these vibration-related problems is to adopt high damping metallic materials. Conventional high damping alloys exhibit damping capacity above 10{sup {minus}2}, however, their densities are usually great than 5 x 10{sup 3} kg m{sup {minus}3}, or their strengths are less than 200 MPa (for alloys based on dislocation damping), making them impossible to be applied to aircraft and aerospace areas. Recently, some low-density high-damping metal/metal composites based on aluminum and high damping alloys have been developed in Beijing Institute of Aeronautical Materials (BIAM) by the rapidly solidified power metallurgy process. This paper aims to report the properties of the composites based on a high temperature Al-Fe-Mo-Si alloy and a high damping Zn-Al alloy, and compare them with that of 2618-T61 alloy produced by the ingot metallurgy process.

  7. Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources

    PubMed Central

    Sobierajski, Ryszard; Loch, Rolf Antonie; van de Kruijs, Robbert W. E.; Louis, Eric; von Blanckenhagen, Gisela; Gullikson, Eric M.; Siewert, Frank; Wawro, Andrzej; Bijkerk, Fred

    2013-01-01

    Amplitude-division beam splitters for XUV radiation sources have been developed and extensively characterized. Mo/Si multilayer coatings were deposited on 50 nm-thick SiN membranes. By changing the multilayer structure (periodicity, number of bilayers, etc.) the intensity of the reflected and transmitted beams were optimized for selected incident radiation parameters (wavelength, incident angle). The developed optical elements were characterized by means of XUV reflectometry and transmission measurements, atomic force microscopy and optical interferometry. Special attention was paid to the spatial homogeneity of the optical response and reflected beam wavefront distortions. Here the results of the characterization are presented and improvements required for advanced applications at XUV free-electron lasers are identified. A flatness as low as 4 nm r.m.s. on 3 × 3 mm beam splitters and 22 nm r.m.s. on 10 × 10 mm beam splitters has been obtained. The high-spatial-frequency surface roughness was about 0.7–1 nm r.m.s. The middle-spatial-frequency roughness was in the range 0.2–0.8 nm r.m.s. The reflection and transmission of the beam splitters were found to be very homogeneous, with a deviation of less than 2% across the full optical element. PMID:23412481

  8. An ultra-high temperature Mo-Si-B based coating for oxidation protection of NbSS/Nb5Si3 composites

    NASA Astrophysics Data System (ADS)

    Su, Linfen; Lu-Steffes, Otto; Zhang, Hu; Perepezko, John H.

    2015-05-01

    A Mo-Si-B based coating was prepared on an NbSS/Nb5Si3 composite by a two-step process consisting of the initial deposition of Mo followed by pack cementation co-deposition of Si and B. After a conditioning treatment, an aluminoborosilica layer fully covered the sample. Following oxidation at 1300 °C for 24 h, the coated sample demonstrated a weight loss of about 0.55 mg/cm2 and the uncoated sample exhibited catastrophic oxidation with a weight gain of 87.6 mg/cm2. These results demonstrate that the Mo-Si-B based coating can enable the use of the NbSS/Nb5Si3 composites at temperature up to 1300 °C in an oxidizing environment.

  9. Microstructural Simulation of Three-Point Bending Test with Mo-Si-B Alloy at High Temperature: Sources of Strain Field Localization

    NASA Astrophysics Data System (ADS)

    Chollacoop, Nuwong; Alur, Amruthavalli P.; Kumar, K. Sharvan

    Deformation behavior in three-point bending test of Mo-Si-B alloy was investigated by recourse to finite element analysis (FEA) with microstructure incorporated. This Mo-Si-B alloy consists of hard, brittle T2 (Mo5SiB2) phase embedded in soft matrix of Mo solid solution. The sample contains pre-crack configuration at the middle in order to study the effect of the second phase (T2 particles) onto a crack tip during the bending test. Various optical micrographs were scanned, digitized and meshed for FEA. It was found that strain localization from the second phase at the crack tip was interfered with that from the loading pin in three-point bending test. Such interference could be reduced by replacement with end moment loading, in order to identify sole strain localization effect from the second phase at the crack tip.

  10. Reaction synthesis of MoSi{sub 2}-Al{sub 2}O{sub 3} composite using MoO{sub 3}, Al and Si powders

    SciTech Connect

    Deevi, S.C.; Deevi, S.

    1995-10-01

    In-situ synthesis of a composite of MoSi{sub 2}-Al{sub 2}O{sub 3} was carried out by reacting a thermite mixture consisting of MoO{sub 3}, Al, and Si powders. The reaction was found to be extremely fast and violent, and a diluent was required to moderate the reaction. Thermal behavior of the thermite mixture was studied using DTA at different heating rates, and DTA was interrupted at different temperatures to determine the reaction mechanism. X-ray characterization of the products obtained at different temperatures reveals that the mechanism consists of a reduction of MoO{sub 3} by Al to MoO{sub 2} followed by a simultaneous oxidation of Al to Al{sub 2}O{sub 3} and synthesis reaction between reduced Mo and Si to form MoSi{sub 2}. The rate determining step is found to be reduction of MoO{sub 2} by Al and oxidation of Al to Al{sub 2}O{sub 3}. The thermite reaction was moderated by adding Mo and Si to the mixture of MoO{sub 3}, Al, and Si such that the ratio of MoSi{sub 2} to the thermite was in the range of 60:40 to 90:10.

  11. Development of a multi-variate calibration approach for quantitative analysis of oxidation resistant Mo-Si-B coatings using laser ablation inductively coupled plasma mass spectrometry

    NASA Astrophysics Data System (ADS)

    Cakara, Anja; Bonta, Maximilian; Riedl, Helmut; Mayrhofer, Paul H.; Limbeck, Andreas

    2016-06-01

    Nowadays, for the production of oxidation protection coatings in ultrahigh temperature environments, alloys of Mo-Si-B are employed. The properties of the material, mainly the oxidation resistance, are strongly influenced by the Si to B ratio; thus reliable analytical methods are needed to assure exact determination of the material composition for the respective applications. For analysis of such coatings, laser ablation inductively coupled mass spectrometry (LA-ICP-MS) has been reported as a versatile method with no specific requirements on the nature of the sample. However, matrix effects represent the main limitation of laser-based solid sampling techniques and usually the use of matrix-matched standards for quantitative analysis is required. In this work, LA-ICP-MS analysis of samples with known composition and varying Mo, Si and B content was carried out. Between known analyte concentrations and derived LA-ICP-MS signal intensities no linear correlation could be found. In order to allow quantitative analysis independent of matrix effects, a multiple linear regression model was developed. Besides the three target analytes also the signals of possible argides (40Ar36Ar and 98Mo40Ar) as well as detected impurities of the Mo-Si-B coatings (108Pd) were considered. Applicability of the model to unknown samples was confirmed using external validation. Relative deviations from the values determined using conventional liquid analysis after sample digestion between 5 and 10% for the main components Mo and Si were observed.

  12. Structure and stress studies of low temperature annealed W/Si multilayers for the X-ray telescope.

    PubMed

    Huang, Qiushi; Zhang, Jinshuai; Qi, Runze; Yang, Yang; Wang, Fengli; Zhu, Jie; Zhang, Zhong; Wang, Zhanshan

    2016-07-11

    Low stress W/Si multilayer mirrors are demanded in the hard X-ray telescopes to achieve the high angular resolution. To reduce the stress of the as-deposited multilayer and maintain a high reflectivity, two groups of low-temperature annealing experiments were performed on the periodic multilayers with a d-spacing of ~3.8 nm. The temperature-dependent experiments show that the 150 °C annealing can slightly increase the reflectivity while the stress reduced only by 24%. Higher temperature annealing induced a larger reduction of the stress and the multilayer reached an almost zero stress state at 250 °C. The stress relaxation was accompanied by a small drop of reflectivity of ≤5% and a period compaction of <0.02 nm. The time-dependent experiments indicate that most of the stress changes occurred within the first 10 minutes while a prolonged annealing is not useful. The X-ray scattering and transmission electron microscopy were further used to study the microstructure changes of the multilayers. It is found that the W/Si multilayer exhibits an amorphous structure before and after annealing, while an enhanced diffusion and intermixing is the main reason for the stress relaxation and structure changes. PMID:27410835

  13. Microwave sintering of MoSi{sub 2}-Mo{sub 5}Si{sub 3} to promote a final nanometer-scale microstructure and suppressing of pesting phenomenon

    SciTech Connect

    Arreguin-Zavala, J. Turenne, S.; Martel, A.; Benaissa, A.

    2012-06-15

    This work shows an innovative sintering process for molybdenum disilicide (MoSi{sub 2}) and molybdenum silicide (Mo{sub 5}Si{sub 3}) in order to have a final nanometer-scale microstructure. Sintered MoSi{sub 2}-Mo{sub 5}Si{sub 3} was fabricated by microwave sintering. The final material showed a significant reduction of pesting phenomena for MoSi{sub 2}. The final microstructure is a mix of micrometer-scale MoSi{sub 2} and nanometer-scale Mo{sub 5}Si{sub 3} immersed in an amorphous SiO{sub 2} phase. This material was characterized by X-Ray diffraction (XRD), Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM) and Thermal Gravimetric Analysis (TGA). - Highlights: Black-Right-Pointing-Pointer We sintered the MoSi{sub 2}-Mo{sub 5}Si{sub 3} by microwave and obtained high final density material. Black-Right-Pointing-Pointer We got a final nanostructured material. Black-Right-Pointing-Pointer We inhibited pesting phenomenon for MoSi{sub 2}.

  14. PROCESSING, MICROSTRUCTURE AND CREEP BEHAVIOR OF Mo-Si-B-BASED INTERMETALLIC ALLOYS FOR VERY HIGH TEMPERATURE STRUCTURAL APPLICATIONS

    SciTech Connect

    Vijay K. Vasudevan

    2005-12-21

    This research project is concerned with developing a fundamental understanding of the effects of processing and microstructure on the creep behavior of refractory intermetallic alloys based on the Mo-Si-B system. During this year, the compressive creep behavior of a Mo-3Si-1B (in wt.%) alloy at 1100 and 1200 C were studied and related to the deformation mechanisms through electron microscopy observations of microstructural changes and deformation structures. The microstructure of this alloy was three-phase, being composed of {alpha}-Mo, Mo{sub 3}Si and T2-Mo{sub 5}SiB{sub 2} phases. Results of compressive creep tests at 1200 and 1100 C showed that the creep rates were quite high at stress levels between 250 and 500 MPa, Two minima in the creep strain rate versus strain data were noted, one at small strain values and the second at much larger strains. A stress exponent of 4.26 was obtained upon plotting the strain rate corresponding to the first minima versus stress, which suggests that dislocation climb and glide dominate the creep process in the early stages. On the other hand, the large strain, minimum creep rate versus stress data gave a stress exponent of {approx}1.18, which indicates diffusional mechanisms and recrystallization dominate the later stages of the creep process. At 1100 C, a stress exponent of 2.26 was obtained, which suggests that both diffusional and dislocation mechanisms contribute to the creep strain. Based on the minimum creep rate data at 1100 C and 1200 C, the activation energy for creep was determined to be 525 kJ/mole, which is somewhat higher than that reported for self diffusion in {alpha}-Mo. Microstructural observations of post-crept samples indicated the presence of many voids in the {alpha}-Mo grains and few cracks in the intermetallic particles and along their interfaces with the {alpha}-Mo matrix. In addition, TEM observations revealed the presence of recrystallized grains and sub-grain boundaries composed of dislocation arrays

  15. Processing, Microstructure and Creep Behavior of Mo-Si-B-Based Intermetallic Alloys for Very High Temperature Structural Applications

    SciTech Connect

    Vijay Vasudevan

    2008-03-31

    This research project is concerned with developing a fundamental understanding of the effects of processing and microstructure on the creep behavior of refractory intermetallic alloys based on the Mo-Si-B system. In the first part of this project, the compression creep behavior of a Mo-8.9Si-7.71B (in at.%) alloy, at 1100 and 1200 C was studied, whereas in the second part of the project, the constant strain rate compression behavior at 1200, 1300 and 1400 C of a nominally Mo-20Si-10B (in at.%) alloy, processed such as to yield five different {alpha}-Mo volume fractions ranging from 5 to 46%, was studied. In order to determine the deformation and damage mechanisms and rationalize the creep/high temperature deformation data and parameters, the microstructure of both undeformed and deformed samples was characterized in detail using x-ray diffraction, scanning electron microscopy (SEM) with back scattered electron imaging (BSE) and energy dispersive x-ray spectroscopy (EDS), electron back scattered diffraction (EBSD)/orientation electron microscopy in the SEM and transmission electron microscopy (TEM). The microstructure of both alloys was three-phase, being composed of {alpha}-Mo, Mo{sub 3}Si and T2-Mo{sub 5}SiB{sub 2} phases. The values of stress exponents and activation energies, and their dependence on microstructure were determined. The data suggested the operation of both dislocation as well as diffusional mechanisms, depending on alloy, test temperature, stress level and microstructure. Microstructural observations of post-crept/deformed samples indicated the presence of many voids in the {alpha}-Mo grains and few cracks in the intermetallic particles and along their interfaces with the {alpha}-Mo matrix. TEM observations revealed the presence of recrystallized {alpha}-Mo grains and sub-grain boundaries composed of dislocation arrays within the grains (in Mo-8.9Si-7.71B) or fine sub-grains with a high density of b = 1/2<111> dislocations (in Mo-20Si-10B), which

  16. Spectral reflectance data of a high temperature stable solar selective coating based on MoSi2 -Si3N4.

    PubMed

    Hernández-Pinilla, D; Rodríguez-Palomo, A; Álvarez-Fraga, L; Céspedes, E; Prieto, J E; Muñoz-Martín, A; Prieto, C

    2016-06-01

    Data of optical performance, thermal stability and ageing are given for solar selective coatings (SSC) based on a novel MoSi2-Si3N4 absorbing composite. SSC have been prepared as multilayer stacks formed by silver as metallic infrared reflector, a double layer composite and an antireflective layer (doi: 10.1016/j.solmat.2016.04.001 [1]). Spectroscopic reflectance data corresponding to the optical performance of samples after moderate vacuum annealing at temperatures up to 600 °C and after ageing test of more than 200 h with several heating-cooling cycles are shown here. PMID:27182544

  17. Spectral reflectance data of a high temperature stable solar selective coating based on MoSi2–Si3N4

    PubMed Central

    Hernández-Pinilla, D.; Rodríguez-Palomo, A.; Álvarez-Fraga, L.; Céspedes, E.; Prieto, J.E.; Muñoz-Martín, A.; Prieto, C.

    2016-01-01

    Data of optical performance, thermal stability and ageing are given for solar selective coatings (SSC) based on a novel MoSi2–Si3N4 absorbing composite. SSC have been prepared as multilayer stacks formed by silver as metallic infrared reflector, a double layer composite and an antireflective layer (doi: 10.1016/j.solmat.2016.04.001 [1]). Spectroscopic reflectance data corresponding to the optical performance of samples after moderate vacuum annealing at temperatures up to 600 °C and after ageing test of more than 200 h with several heating–cooling cycles are shown here. PMID:27182544

  18. Modified SiC-MoSi2 Oxidation Protective Coating for SiC-COATED Carbon/carbon Composites Through Infiltrating Liquid Si

    NASA Astrophysics Data System (ADS)

    Zhang, Zheng-Zhong; Li, He-Jun; Ma, Chao; Fu, Qian-Gang; Zhang, Yu-Lei; Wu, Heng; Tao, Jun

    To improve the oxidation resistance of the SiC-MoSi2 coating prepared by two-step pack cementation, a liquid Si infiltrating method was adopted to modify it. The phase composition and microstructure of the coatings were analyzed by XRD and SEM. The results show that the size and number of the cracks in the modified coating decreased evidently after infiltrating Si. The oxidation test results in air at 1773 K show that the mass loss of the SiC-MoSi2 coating coated carbon/carbon (C/C) composites was up to 1.18% after oxidation for 206 h, while that of the modified coating coated C/C composites was only 0.77% after oxidation for 460 h. The reason is that the cracks formed in the pack cementation process were partly sealed and there were no penetrable cracks in the modified coating. Therefore, there were no direct channels for the oxygen to diffuse into the C/C substrate.

  19. Experimental investigation of the dynamic elastic modulus and vibration damping in MoSi{sub 2}-30%Si{sub 3}N{sub 4} as a function of temperature

    SciTech Connect

    Olsen, G.T.; Wolfenden, A.; Hebsur, M.G.

    2000-02-01

    The dynamic elastic modulus, E, and vibration damping of molybdenum disilicide (MoSi{sub 2}) with 30% volume addition of silicon nitride (Si{sub 3}N{sub 4}) were measured at varying temperatures using the piezoelectric ultrasonic composite oscillator technique (PUCOT). The value of the elastic modulus of the composite was observed to decrease as temperature, T, was increased. The value of dE/dT of MoSi{sub 2} was determined to be {minus}0.03 GPa/K. The vibration damping of MoSi{sub 2}-30%Si{sub 3}N{sub 4} increased as temperature was increased, with an effective activation energy of 0.076 eV/atom. This was an average over the entire temperature range, but two distinct slopes were observed in the plot of damping versus inverse temperature.

  20. Time dependent changes in Schottky barrier mapping of the W/Si(001) interface utilizing ballistic electron emission microscopy

    SciTech Connect

    Durcan, Chris A.; Balsano, Robert; LaBella, Vincent P.

    2015-06-28

    The W/Si(001) Schottky barrier height is mapped to nanoscale dimensions using ballistic electron emission microscopy (BEEM) over a period of 21 days to observe changes in the interface electrostatics. Initially, the average spectrum is fit to a Schottky barrier height of 0.71 eV, and the map is uniform with 98% of the spectra able to be fit. After 21 days, the average spectrum is fit to a Schottky barrier height of 0.62 eV, and the spatial map changes dramatically with only 27% of the spectra able to be fit. Transmission electron microscopy shows the formation of an ultra-thin tungsten silicide at the interface, which increases in thickness over the 21 days. This increase is attributed to an increase in electron scattering and the changes are observed in the BEEM measurements. Interestingly, little to no change is observed in the I-V measurements throughout the 21 day period.

  1. Microstructure and property modifications of an AISI H13 (4Cr5MoSiV) steel induced by pulsed electron beam treatment

    SciTech Connect

    Zhang Kemin; Zou Jianxin; Grosdidier, Thierry; Dong Chuang

    2010-11-15

    In the present work, surface modifications generated by the low energy high current pulsed electron beam (LEHCPEB) treatments have been investigated on an AISI H13 (4Cr5MoSiV) steel. From the observations of scanning electron microscopy, x-ray diffraction, and electron back scattering diffraction determinations, it could be established that the final structure in the melted layer is a mixture of ultrafine {delta} phase, martensite, and residual austenite. The formation of the heterogeneous microstructures on the surface layer is related to the very rapid heating, melting, solidification, and cooling induced by the LEHCPEB irradiation. After the LEHCPEB treatment, the wear resistance of the steel effectively improved. This can be mainly attributed to the higher hardness of the ultrafine structures formed on the top surface and the hardened subsurface layers after the treatment.

  2. Reflection-absorption infrared spectroscopic study on a CuO X/SiO 2 model catalyst prepared by spin-coating on a SiO 2/W/Si(100) buried metal substrate

    NASA Astrophysics Data System (ADS)

    Fukui, Ken-ichi; Oshima, Itaru; Oosterbeek, Heiko; Iwasawa, Yasuhiro

    1999-01-01

    CuO X particles were deposited by spin-coating on a SiO 2(50 nm)/W(70 nm)/Si(100) buried metal substrate using 2-propanol solution of a Cu precursor followed by oxidation. The CuO X/SiO 2/W/Si model catalyst was used to detect vibrational modes of submonolayer adsorbates by reflection-absorption infrared spectroscopy (RAIRS). During methanol reaction on CuO X/SiO 2/W/Si, RAIR spectra showed that methoxy species was formed on CuO X particles and spilt over to the SiO 2 substrate, replacing hydroxyl species.

  3. Evaluation of backside particle contamination and electrostatic chuck design on the cleanliness of EUV reticle mask blanks in a multilayer Mo/Si ion beam deposition system

    NASA Astrophysics Data System (ADS)

    Hayes, A. V.; Randive, R.; Reiss, I.; Menendez, J.; Kearney, P.; Sugiyama, T.

    2008-10-01

    A key requirement for the success of EUV lithography is a high volume supply of defect-free Mo/Si multilayer (ML)- coated mask blanks. The process of fabricating mask blanks is particularly sensitive to particle contamination because decoration by the deposition of the reflective stack on sub-lithographic (< 22 nm) particles can create larger, printable defects. One possible source of added defects is the mask substrate fixturing method, which, in the Veeco ion beam deposition (IBD) system used to deposit our ML coatings, must allow tilt and rotation of a vertically oriented substrate. As commonly practiced, an electrostatic chuck (ESC) is used instead of a mechanical clamping fixture to avoid transferring particles to the front surface of the mask by mechanical clamping and declamping operations. However, a large number of particles can be introduced to the backside of the mask by electrostatic clamping. Up to now, there has been little concern about such backside particles, except for relatively large particles (> 1 micron) that may affect out-of-plane distortion of the mask in an EUV lithography tool. As the cleanliness of the EUV masks and mask blank fabrication approaches perfection, however, there is more concern that particles transferred from the backside to the frontside of the mask may be a significant issue. Such transfer may occur in the deposition chamber, in the substrate cassette, or in the transfer module and may be indirect. In this paper, we present data from characterizing the amount, size, shape, composition, and location of the backside particle defects generated by electrostatic clamping, using a particle counter and scanning electron microscope (SEM), and compare results for a pin-type e-chuck, which has a small contact area, with the standard flat e-chuck. The key result is a 10X to 30X reduction in the total number of backside particles for the pin chuck. Also, preliminary data indicates that the pin chuck stays cleaner under service

  4. FeAI and Mo-Si-B Intermetallic Coatings Prepared by Thermal Spraying

    SciTech Connect

    Terry C. Totemeier; Richard N. Wright; W. David Swank

    2004-12-01

    FeAl and Mo–Si–B intermetallic coatings for elevated temperature environmental resistance were prepared using high-velocity oxy-fuel (HVOF) and air plasma spray (APS) techniques. For both coating types, the effect of coating parameters (spray particle velocity and temperature) on the microstructure and physical properties of the coatings was assessed. Fe–24Al (wt%) coatings were prepared using HVOF thermal spraying at spray particle velocities varying from 540 to 700 m/s. Mo–13.4Si–2.6B coatings were prepared using APS at particle velocities of 180 and 350 m/s. Residual stresses in the HVOF FeAl coatings were compressive, while stresses in the APS Mo–Si–B coatings were tensile. In both cases, residual stresses became more compressive with increasing spray particle velocity due to increased peening imparted by the spray particles. The hardness and elastic moduli of FeAl coatings also increased with increasing particle velocity. For Mo–Si–B coatings, plasma spraying at 180 m/s resulted in significant oxidation of the spray particles and conversion of the T1 phase into amorphous silica and a-Mo. The T1 phase was retained after spraying at 350 m/s.

  5. Modification of Mo-Si alloy microstructure by small additions of Zr.

    PubMed

    Mousa, M; Wanderka, N; Timpel, M; Singh, S; Krüger, M; Heilmaier, M; Banhart, J

    2011-05-01

    Molybdenum and its alloys are potential materials for high-temperature applications. However, molybdenum is susceptible to embrittlement because of oxygen segregation at the grain boundaries. In order to alleviate the embrittlement small amounts of zirconium were alloyed to a solid solution of Mo-1.5Si alloy. Two Mo-based alloys, namely Mo-1.5Si and Mo-1.5Si-1Zr, were investigated by the complementary high-resolution methods transmission electron microscopy and atom probe tomography. The Mo-1.5Si alloy shows a polycrystalline structure with two silicon-rich intermetallic phases Mo(5)Si(3) and Mo(3)Si located at the grain boundaries and within the grains. In addition, small clusters with up to 10 at% Si were found within the molybdenum solid solution. Addition of a small amount of zirconium to Mo-1.5Si leads to the formation of two intermetallic phases Mo(2)Zr and MoZr(2), which are located at the grain boundaries as well as within the interior of the grain. Transmission electron microscopy shows that small spherical Mo-Zr-rich precipitates (<10nm) decorate the grain boundaries. The stoichiometry of the small precipitates was identified as Mo(2)Zr by atom probe tomography. No Si-enriched small precipitates were detected in the Mo-1.5Si-1Zr alloy. It is concluded that the presence of zirconium hinders their formation. PMID:21215523

  6. Phase Stability and Deformation Behavior of Mo-Si-B System and effect of alloying

    NASA Astrophysics Data System (ADS)

    Kontsevoi, Oleg Y.; Freeman, Arthur J.

    2012-02-01

    Molybdenum silicides are promising materials for ultra-high temperature applications above 1300 C. One of the main drawbacks is their brittleness at low temperatures, which may be improved by additions. We employ first principles calculations with the highly precise FLAPW method to investigate the effect of alloying with 3d, 4d and 5d transition metals on phase stability, cleavage and shear characteristics of the 3-component system Mo -- Mo3Si -- Mo5SiB2. We determined site preference, phase partitioning of alloying elements, and their effect on shear behavior and preferred deformation modes. We show that in Mo3Si alloying with 3d transition metals results in a significant reduction of energy barriers to shear deformation (softening effect), while 4d and 5d additions increase shear barriers (hardening effect). In Mo5SiB2, 3d transition metals (except for Ti) act as weak softeners, while 4d and 5d show mixed behavior -- hardening for early elements and softening for late ones. The softening potency of additions increases with atomic number, but exhibits non-monotonic behavior as a result of a competition between size and electronic effects. The results are discussed in conjunction with possible pathways to ductility enhancement through alloying.

  7. Fracture and fatigue resistance of Mo-Si-B alloys for ultrahigh-temperature structural applications

    SciTech Connect

    Kruzic, J.J.; Schneibel, J.H.; Ritchie, R.O.

    2003-08-29

    Fracture and fatigue-crack growth properties are examined for a series of Mo-Mo3Si-Mo5SiB2 containing alloys, which utilize a continuous a-Mo matrix to achieve unprecedented room-temperature fracture resistance (>20 MPaAm). Mechanistically, these properties are explained in terms of toughening by crack trapping and crack bridging by the more ductile a-Mo phase.

  8. Pest resistant MoSi.sub.2 materials and method of making

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G. (Inventor)

    1995-01-01

    A pest resistant molybdenum disilicide composition is provided for use in high temperature structural applications. The composition includes molybdenum disilicide and silicon nitride and can be used to prepare improved reinforced composites.

  9. Magnetic properties of nanocrystalline FeCuNb(Sb/W)SiB alloys

    SciTech Connect

    Degro, J.; Vojtanik, P.; Konc, M.; Zentko, A.; Csach, K.; Ocelik, V.

    1994-03-01

    The magnetic relaxation {Delta}r/r, the perminvar critical field H{sub CR}, the initial susceptibility {chi}{sub 10}, the coercive field H{sub c} as a function of annealing temperature in Fe{sub 73.5}Cu{sub 1}Nb{sub 2.95}Sb{sub 0.05}Si{sub 13.5}B{sub 9} and Fe{sub 73.5}Cu{sub 1}W{sub 3}Si{sub 13.5}B{sub 9} alloys were investigated. DSC measurements and thermomagnetic analyses were also done. The results using random anisotropy model can be explained.

  10. Front-end ASICs development for W Si calorimeter at ILC (CALICE collaboration)

    NASA Astrophysics Data System (ADS)

    Fleury, Julien; de La Taille, Christophe; Martin-Chassard, Gisèle

    2007-03-01

    An ASIC (FLC_PHY3) has been developed to read out the test-beam prototype of the future international linear collider (ILC) tungsten-silicon calorimeter. It consists of 18 channels low-noise charge preamplifiers, bi-gain CRRC2 180 ns shapers, 12-bit track-and-hold, and a 5 MHz output multiplexer. It covers a dynamic range of 14 bits with a noise of 3500 e - with the 70 pF detector and a linearity at the per-mil level. The chip dissipates 6 mW/channel and 1000 chips have been produced in AMS 0.8 μm BiCMOS technology in 2003. One channel has recently been migrated into 0.35 μm, improving the series noise by 20% and the 1/ f noise by two. Besides, a power pulsing feature has been added in order to exploit the 1% duty cycle of the accelerator. This feature is a key parameter for ILC, as it is mandatory to embed the front-end inside the detector, without spoiling the Moliere radius with cooling pipes. Preliminary results indicate a good behavior in pulsing mode and several hundred channels have been produced of the recent version including this feature (FLC_PHY4), to be tested extensively in test beam at CERN in autumn 2006. FLC_PHY4 also includes a 12-bit ADC in order to take a step to the final version, which will send digital data out.

  11. Nano-optical single-photon response mapping of waveguide integrated molybdenum silicide (MoSi) superconducting nanowires.

    PubMed

    Li, Jian; Kirkwood, Robert A; Baker, Luke J; Bosworth, David; Erotokritou, Kleanthis; Banerjee, Archan; Heath, Robert M; Natarajan, Chandra M; Barber, Zoe H; Sorel, Marc; Hadfield, Robert H

    2016-06-27

    We present low temperature nano-optical characterization of a silicon-on-insulator (SOI) waveguide integrated SNSPD. The SNSPD is fabricated from an amorphous Mo83Si17 thin film chosen to give excellent substrate conformity. At 350 mK, the SNSPD exhibits a uniform photoresponse under perpendicular illumination, corresponding to a maximum system detection efficiency of approximately 5% at 1550 nm wavelength. Under these conditions 10 Hz dark count rate and 51 ps full width at half maximum (FWHM) timing jitter is observed. PMID:27410555

  12. Electronic Properties of MoSi2-Type Hf2X Intermetallic Compounds (X=Pd, Ag, Cd)

    NASA Astrophysics Data System (ADS)

    Yaar, I.; Maytal-Beck, S.; Berant, Z.

    2001-11-01

    The Hf z coordinate and the value of the electric field gradient (efg) main component (V zz ), were calculated for three Hf2X compounds (X = Pd, Ag, Cd) on a first-principle basis, using the full potential linear augmented plane wave (LAPW) method. Exchange and correlation effects were treated either by the local spine density approximation (LSDA) or by the more advanced generalized gradient approximation (GGA). The calculated V zz values, in the Hf site, were in very good agreement with available 181Hf TDPAC experimental results.

  13. Investigation of Shock-Induced Chemical Reactions in Mo-Si Powder Mixtures Using Instrumented Experiments with PVDF Stress Gauges

    SciTech Connect

    Vandersall, K S; Thadhani, N N

    2001-05-29

    Shock-induced chemical reactions in {approx}58% dense Mo+2Si powder mixtures were investigated using time-resolved instrumented experiments, employing PVDF-piezoelectric stress gauges placed at the front and rear surfaces of the powders to measure the input and propagated stresses, and wave speed through the powder mixture. Experiments performed on the powders at input stresses less than 4 GPa, showed characteristics of powder densification and dispersed propagated wave stress profiles with rise time > {approx}40 nanoseconds. At input stress between 4-6 GPa, the powder mixtures showed a sharp rise time (<{approx}10 ns) of propagated wave profile and an expanded state of products revealing evidence of shock-induced chemical reaction. At input stresses greater than 6 GPa, the powder mixtures showed a slower propagated-stress-wave rise time and transition to a low-compressibility (melt) state indicating lack of shock-induced reaction. The results illustrate that premature melting of Si, at input stresses less than the crush-strength of the powder mixtures, restricts mixing between reactants and inhibits ''shock-induced'' reaction initiation.

  14. Study on the lifetime of Mo/Si multilayer optics with pulsed EUV-source at the ETS

    NASA Astrophysics Data System (ADS)

    Schürmann, Mark; Yulin, Sergiy; Nesterenko, Viatcheslav; Feigl, Torsten; Kaiser, Norbert; Tkachenko, Boris; Schürmann, Max C.

    2011-06-01

    As EUV lithography is on its way into production stage, studies of optics contamination and cleaning under realistic conditions become more and more important. Due to this fact an Exposure Test Stand (ETS) has been constructed at XTREME technologies GmbH in collaboration with Fraunhofer IOF and with financial support of Intel Corporation. This test stand is equipped with a pulsed DPP source and allows for the simultaneous exposure of several samples. In the standard set-up four samples with an exposed area larger than 35 mm2 per sample can be exposed at a homogeneous intensity of 0.25 mW/mm2. A recent update of the ETS allows for simultaneous exposures of two samples with intensities up to 1.0 mW/mm2. The first application of this alternative set-up was a comparative study of carbon contamination rates induced by EUV radiation from the pulsed source with contamination rates induced by quasicontinuous synchrotron radiation. A modified gas-inlet system allows for the introduction of a second gas to the exposure chamber. This possibility was applied to investigate the efficiency of EUV-induced cleaning with different gas mixtures. In particular the enhancement of EUV-induced cleaning by addition of a second gas to the cleaning gas was studied.

  15. Time-differential perturbed angular correlation study of the electric field gradient in Ti2Rh MoSi2-type compound

    NASA Astrophysics Data System (ADS)

    Wodniecki, P.; Kulińska, A.; Wodniecka, B.

    The electric field gradient (EFG) at the 181Hf→181Ta site in Ti2Rh C11 b -type compound was measured as a function of temperature using time-differential perturbed angular correlation (TDPAC) technique. The room temperature results show one EFG with the parameters of: ν Q =336(1) MHz→V zz =5.9×1017 V cm-2, η=0.1. Very week linear temperature dependence of this EFG was measured with the slope of 3.6 (2)×10-5 K-1. The results are compared with those for other isostructural compounds.

  16. Time-differential perturbed angular correlation study of the electric field gradient in Ti2Rh MoSi2-type compound

    NASA Astrophysics Data System (ADS)

    Wodniecki, P.; Kulińska, A.; Wodniecka, B.

    2007-06-01

    The electric field gradient (EFG) at the 181Hf→181Ta site in Ti2Rh C11 b -type compound was measured as a function of temperature using time-differential perturbed angular correlation (TDPAC) technique. The room temperature results show one EFG with the parameters of: ν Q = 336(1) MHz→V zz =5.9 × 1017 V cm - 2, η = 0.1. Very week linear temperature dependence of this EFG was measured with the slope of 3.6 (2) × 10 - 5 K - 1. The results are compared with those for other isostructural compounds.

  17. Optimization of graded multilayer designs for astronomical X-ray telescopes.

    PubMed

    Mao, P H; Harrison, F A; Windt, D L; Christensen, F E

    1999-08-01

    We developed a systematic method for optimizing the design of depth-graded multilayers for astronomical hard-x-ray and soft-gamma-ray telescopes based on the instrument's bandpass and the field of view. We apply these methods to the design of the conical-approximation Wolter I optics employed by the balloon-borne High Energy Focusing Telescope, using W/Si as the multilayer materials. In addition, we present optimized performance calculations of mirrors, using other material pairs that are capable of extending performance to photon energies above the W K-absorption edge (69.5 keV), including Pt/C, Ni/C, Cu/Si, and Mo/Si. PMID:18323965

  18. Comparison of the Thermal Expansion Behavior of Several Intermetallic Silicide Alloys Between 293 and 1523 K

    NASA Technical Reports Server (NTRS)

    Raj, Sai V.

    2014-01-01

    Thermal expansion measurements were conducted on hot-pressed CrSi(sub 2), TiSi(sub 2), W Si(sub 2) and a two-phase Cr-Mo-Si intermetallic alloy between 293 and 1523 K during three heat-cool cycles. The corrected thermal expansion, (L/L(sub 0)(sub thermal), varied with the absolute temperature, T, as (deltaL/L(sub 0)(sub thermal) = A(T-293)(sup 3) + B(T-293)(sup 2) + C(T-293) + D, where A, B, C and D are regression constants. Excellent reproducibility was observed for most of the materials after the first heat-up cycle. In some cases, the data from the first heatup cycle deviated from those determined in the subsequent cycles. This deviation was attributed to the presence of residual stresses developed during processing, which are relieved after the first heat-up cycle.

  19. Amorphous metallizations for high-temperature semiconductor device applications

    NASA Technical Reports Server (NTRS)

    Wiley, J. D.; Perepezko, J. H.; Nordman, J. E.; Kang-Jin, G.

    1981-01-01

    The initial results of work on a class of semiconductor metallizations which appear to hold promise as primary metallizations and diffusion barriers for high temperature device applications are presented. These metallizations consist of sputter-deposited films of high T sub g amorphous-metal alloys which (primarily because of the absence of grain boundaries) exhibit exceptionally good corrosion-resistance and low diffusion coefficients. Amorphous films of the alloys Ni-Nb, Ni-Mo, W-Si, and Mo-Si were deposited on Si, GaAs, GaP, and various insulating substrates. The films adhere extremely well to the substrates and remain amorphous during thermal cycling to at least 500 C. Rutherford backscattering and Auger electron spectroscopy measurements indicate atomic diffussivities in the 10 to the -19th power sq cm/S range at 450 C.

  20. A 10-kW SiC Inverter with A Novel Printed Metal Power Module With Integrated Cooling Using Additive Manufacturing

    SciTech Connect

    Chinthavali, Madhu Sudhan; Ayers, Curtis William; Campbell, Steven L; Wiles, Randy H; Ozpineci, Burak

    2014-01-01

    With efforts to reduce the cost, size, and thermal management systems for the power electronics drivetrain in hybrid electric vehicles (HEVs) and plug-in hybrid electric vehicles (PHEVs), wide band gap semiconductors including silicon carbide (SiC) have been identified as possibly being a partial solution. This paper focuses on the development of a 10-kW all SiC inverter using a high power density, integrated printed metal power module with integrated cooling using additive manufacturing techniques. This is the first ever heat sink printed for a power electronics application. About 50% of the inverter was built using additive manufacturing techniques.

  1. Multilevel and long retentive resistive switching in low temperature nanostructured Cu/SiO{sub x}-W-SiO{sub x}/Pt

    SciTech Connect

    Wang, Jinzhi Wang, Fang; Hu, Guoqi; Liu, Xianglian; Chi, Zhenhua; Chen, Renjie; Yan, Aru; Li, Runwei

    2013-11-18

    Amorphous SiO{sub x}-based memory films are fabricated at room temperature, and study on their resistive switching characteristics and improvement approaches is performed. Multilevel resistive states with large ratio 1: ∼10{sup 2}: 3 × 10{sup 5} and long retention exceeding 2 × 10{sup 6} s at ambient temperature and humidity are observed in Cu/SiO{sub x} (9 nm)-W (∼2 nm)-SiO{sub x} (9 nm)/Pt ultrathin stack. Nonvolatile switching is consistently realized in microscopy. Based on investigations of microscopic conduction and microstructure, tungsten incorporation with copper as relay bridges for conducting filaments is proposed to attribute to the performance improvement and the multilevel switching mechanism.

  2. Conceptual design study of concentrator enhanced solar arrays for space applications. 2kW Si and GaAs systems at 1 AU

    NASA Technical Reports Server (NTRS)

    1980-01-01

    The effect of concentration level on the specific power for a deployable, thin, gallium arsenide cell array in geosynchronous orbit for 10 years in conjunction with a two dimensional flat plate trough concentrator (V trough) and also with a multiple flat plate concentrator was investigated as well as the effects for a conventional silicon cell array on a rigid substrate. For application to a thin GaAs array at 1 AU for 10 years, the V trough produces a 19% benefit in specific power and a dramatic reduction in array area, while the multiple flat plate collector design is not only of no benefit, but is a considerable detriment. The benefit it achieves by reducing array area is duplicated by the 2D design. For the silicon array on a rigid substrate, improvement in performance due to a concentrator with ordinary mirror coating is quite small: 9% increase in specific power, and 13% reduction in array area. When the concentrator mirrors are coated with an improved cold mirror coating, somewhat more significant results are obtained: 31% specific power improvement; and 27% area reduction. In both cases, a 10 year exposure reduces BOL output by 23%.

  3. Performance of Multilayer Monochromators for Hard X-Ray Imaging with Coherent Synchrotron Radiation

    SciTech Connect

    Dietsch, R.; Holz, T.; Kraemer, M.; Weissbach, D.; Rack, A.; Weitkamp, T.; Morawe, Ch.; Cloetens, P.; Ziegler, E.; Riotte, M.; Rack, T.; Siewert, F.

    2011-09-09

    We present a study in which multilayers of different periodicity (from 2.5 to 5.5 nm), composition (W/Si, Mo/Si, Pd/B{sub 4}C, Ru/B{sub 4}C), and numbers of layers have been compared. Particularly, we chose mirrors with similar intrinsic quality (roughness and reflectivity) to study their performance (flatness and coherence of the outgoing beam) as monochromators in synchrotron radiography. The results indicate that material composition is the dominating factor for the performance. This is important to consider for future developments in synchrotron-based hard x-ray imaging methods. In these techniques, multilayer monochromators are popular because of their good tradeoff between spectral bandwidth and photon flux density of the outgoing beam, but sufficient homogeneity and preservation of the coherent properties of the reflected beam are major concerns. The experimental results we collected may help scientists and engineers specify multilayer monochromators and can contribute to better exploitation of the advantages of multilayer monochromators in microtomography and other full-field imaging techniques.

  4. Novel CD control of HTPSM by advanced process for sub-20nm tech

    NASA Astrophysics Data System (ADS)

    Jo, Sangjin; Choi, Chungseon; Oh, Sunghyun; Ha, Taejoong; Lee, Youngmo; Kim, Sangpyo; Yim, Donggyu

    2015-10-01

    As the design rule of the semiconductor shrinks, the CD MTT (Critical Dimension Mean-to-Target) specification for photomask becomes tighter. So, more precise control of CD MTT is required. We have investigated the CD MTT control and applied it to the attenuated PSM (Phase Shift Mask) successfully for several years. We can control the CD MTT of MoSi pattern by measuring Cr/MoSi pattern to estimate MoSi pattern CD and additional etch to shrink MoSi pattern as reported in previous study. At first, the MoSi pattern CD can be estimated with the Cr/MoSi pattern CD because the CD gap between MoSi pattern and Cr/MoSi pattern is relatively constant. Additional MoSi etch is performed to shrink the MoSi pattern CD after then. The CD gap alwasys exists and the variation of the CD gap is enough small to be not considered in conventional photomask production until now. However, the variation of the CD gap is not ignorable in case of sub-20 nm tech. In this study, we investigated new method to measure MoSi pattern CD before Cr strip process to eliminate the CD gap between MoSi pattern and Cr/MoSi pattern. To eliminate the CD gap, we attempt three solutions - 1) Optimize etch process to perform perfect Cr/MoSi pattern profile without the CD gap, 2) Improve CD measurement accuracy by developing new SEM measuring mechanism, 3) Develop of new process to modify Cr/MoSi pattern profile to be measured without the CD gap. It was found that the CD gap can be eliminated and MoSi pattern CD can be measured perfectly. Finally, MoSi pattern CD control was improved because of CD gap elimination.

  5. MOLYBDENUM DISILICIDE MATERIALS FOR GLASS MELTING SENSOR SHEATHS

    SciTech Connect

    J. PETROVIC; R. CASTRO; ET AL

    2001-01-01

    Sensors for measuring the properties of molten glass require protective sensor sheaths in order to shield them from the extremely corrosive molten glass environment. MoSi{sub 2} has been shown to possess excellent corrosion resistance in molten glass, making it a candidate material for advanced sensor sheath applications. MoSi{sub 2}-coated Al{sub 2}O{sub 3} tubes, MoSi{sub 2}-Al{sub 2}O{sub 3} laminate composite tubes, and MoSi{sub 2}-Al{sub 2}O{sub 3} functionally graded composite tubes have been produced by plasma spray-forming techniques for such applications.

  6. High temperature structural silicides

    SciTech Connect

    Petrovic, J.J.

    1997-03-01

    Structural silicides have important high temperature applications in oxidizing and aggressive environments. Most prominent are MoSi{sub 2}-based materials, which are borderline ceramic-intermetallic compounds. MoSi{sub 2} single crystals exhibit macroscopic compressive ductility at temperatures below room temperature in some orientations. Polycrystalline MoSi{sub 2} possesses elevated temperature creep behavior which is highly sensitive to grain size. MoSi{sub 2}-Si{sub 3}N{sub 4} composites show an important combination of oxidation resistance, creep resistance, and low temperature fracture toughness. Current potential applications of MoSi{sub 2}-based materials include furnace heating elements, molten metal lances, industrial gas burners, aerospace turbine engine components, diesel engine glow plugs, and materials for glass processing.

  7. Mechanical properties of molybdenum disilicide based materials consolidated by hot isostatic pressing (HIP)

    SciTech Connect

    Suryanarayanan, R.; Sastry, S.M.L.; Jerina, K.L. . Dept. of Mechanical Engineering)

    1994-11-01

    The influence of hot isostatic pressing (HIP) consolidation parameters on the mechanical properties of molybdenum disilicide (MoSi[sub 2]) and MoSi[sub 2] reinforced with ductile and brittle reinforcements was studied. MoSi[sub 2], MoSi[sub 2]-20 vol.% coarse and fine niobium powder and MoSi[sub 2]-20 vol.% silicon carbide whiskers consolidated by HIP at 1,200--1,400 C, 207 MPa, for 1 and 4 h were tested in compression for elevated temperature strength and creep resistance. Single-edge-notched specimens of the three materials were tested in a three-point bend configuration for fracture toughness. Mechanical properties were related with consolidation parameters and post-HIP microstructures.

  8. New alloys for pressure vessels and piping

    SciTech Connect

    Prager, M.; Cantzler, C. )

    1990-01-01

    This book describes new alloys for pressure vessels and piping applications. Topics include: Cr-Mo-Si alloys, HAZ liquation cracking in lean 316 stainless steels, copper bearing stainless steels, and Ni-Cr-W-Mo alloys.

  9. Effects of Ti, Zr, and Hf on the Phase Stability of Mo-Mo3Si+Mo5SiB2 Alloys at 1600 C

    SciTech Connect

    Yang, Ying; Bei, Hongbin; Chen, Shuanglin; George, Easo P; Tiley, Jaimie; Chang, Y. Austin

    2010-01-01

    Understanding the stability of the three-phase Mo{_}+Mo{sub 3}Si+Mo{sub 5}SiB{sub 2} region is important for alloy design of Mo-Si-B-based refractory metal intermetallic composites. In this work, thermodynamic modeling is coupled with guided experiments to study phase stability in this three-phase region of the Mo-Si-B-X (X = Ti, Zr, Hf) system. Both the calculated and experimental results show that additions of Zr and Hf limit significantly the stability of the three-phase region because of the formation of the ternary phases MoSiZr and MoSiHf, while Ti addition leads to a much larger region of stability for the three-phase equilibrium.

  10. Chemical Reactions in the Processing of Mosi2 + Carbon Compacts

    NASA Technical Reports Server (NTRS)

    Jacobson, Nathan S.; Lee, Kang N.; Maloy, Stuart A.; Heuer, Arthur H.

    1993-01-01

    Hot-pressing of MoSi2 powders with carbon at high temperatures reduces the siliceous grain boundary phase in the resultant compact. The chemical reactions in this process were examined using the Knudsen cell technique. A 2.3 wt pct oxygen MoSi2 powder and a 0.59 wt pct oxygen MoSi2 powder, both with additions of 2 wt pct carbon, were examined. The reduction of the siliceous grain boundary phase was examined at 1350 K and the resultant P(SiO)/P(CO) ratios interpreted in terms of the SiO(g) and CO(g) isobars on the Si-C-O predominance diagram. The MoSi2 + carbon mixtures were then heated at the hot-pressing temperature of 2100 K. Large weight losses were observed and could be correlated with the formation of a low-melting eutectic and the formation and vaporization of SiC.

  11. High temperature stability multilayers for EUV condenser optics

    SciTech Connect

    Bajt, S; Stearns, D G

    2005-05-03

    We investigate the thermal stability of Mo/SiC multilayer coatings at elevated temperatures. Transmission electron microscopy and x-ray diffraction studies show that upon annealing a thermally-induced structural relaxation occurs that transforms the polycrystalline Mo and amorphous SiC layers in as-deposited multilayers into amorphous Mo-Si-C alloy and crystalline SiC, respectively. After this relaxation process is complete the multilayer is stable at temperatures up to 400 C.

  12. MECHANICAL BEHAVIOR OF MOLYBDENUM DISILICIDE-BASED ALLOYS

    SciTech Connect

    A. MISRA; A. SHARIF; ET AL

    2000-12-01

    We have investigated the mechanical behavior of the following single-phase polycrystalline alloys with the MoSi{sub 2} body-center tetragonal structure: MoSi{sub 2} alloyed with {approximately}2.5 at.% Re, MoSi{sub 2} alloyed with 2 at.% Al, MoSi{sub 2} alloyed with 1 at.% Nb, and MoSi{sub 2} alloyed with 1 at.% Re and 2 at.% Al. Several anomalies in the mechanical behavior of alloyed materials were observed. For example, (1) addition of only {approximately}2.5 at. % Re results in an order of magnitude increase in compressive strength at 1600 C, (2) additions of Nb and Al cause solution softening at near-ambient temperatures, and (3) quaternary MoSi{sub 2}-Re-Al alloys show strengthening at elevated temperatures and reduction in flow stress with enhanced plasticity at near-ambient temperatures in compression. The mechanisms of anomalous solution hardening and softening are discussed.

  13. Combustion synthesis of molybdenum silicides and borosilicides for ultrahigh-temperature structural applications

    NASA Astrophysics Data System (ADS)

    Alam, Mohammad Shafiul

    Molybdenum silicides and borosilicides are promising structural materials for gas-turbine power plants. A major challenge, however, is to simultaneously achieve high oxidation resistance and acceptable mechanical properties at high temperatures. For example, molybdenum disilicide (MoSi2) has excellent oxidation resistance and poor mechanical properties, while Mo-rich silicides such as Mo5Si3 (called T 1) have much better mechanical properties but poor oxidation resistance. One approach is based on the fabrication of MoSi2-T 1 composites that combine high oxidation resistance of MoSi2 and good mechanical properties of T1. Another approach involves the addition of boron to Mo-rich silicides for improving their oxidation resistance through the formation of a borosilicate surface layer. In particular, Mo 5SiB2 (called T2) phase is considered as an attractive material. In the thesis, MoSi2-T1 composites and materials based on T2 phase are obtained by mechanically activated SHS. Use of SHS compaction (quasi-isostatic pressing) significantly improves oxidation resistance of the obtained MoSi2-T1 composites. Combustion of Mo-Si-B mixtures for the formation of T2 phase becomes possible if the composition is designed for the addition of more exothermic reactions leading to the formation of molybdenum boride. These mixtures exhibit spin combustion, the characteristics of which are in good agreement with the spin combustion theory. Oxidation resistance of the obtained Mo-Si-B materials is independent on the concentration of Mo phase in the products so that the materials with a higher Mo content are preferable because of better mechanical properties. Also, T2 phase has been obtained by the chemical oven combustion synthesis technique.

  14. Recovery of Multilayer-Coated Zerodur and ULE Optics for Extreme-Ultraviolet Lithography by Recoating, Reactive-Ion Etching, and Wet-Chemical Processes.

    PubMed

    Mirkarimi, P B; Baker, S L; Montcalm, C; Folta, J A

    2001-01-01

    Extreme-ultraviolet lithography requires expensive multilayer-coated Zerodur or ULE optics with extremely tight figure and finish specifications. Therefore it is desirable to develop methods to recover these optics if they are coated with a nonoptimum multilayer films or in the event that the coating deteriorates over time owing to long-term exposure to radiation, corrosion, or surface contamination. We evaluate recoating, reactive-ion etching, and wet-chemical techniques for the recovery of Mo/Si and Mo/Be multilayer films upon Zerodur and ULE test optics. The recoating technique was successfully employed in the recovery of Mo/Si-coated optics but has the drawback of limited applicability. A chlorine-based reactive-ion etch process was successfully used to recover Mo/Si-coated optics, and a particularly large process window was observed when ULE optics were employed; this is an advantageous for large, curved optics. Dilute HCl wet-chemical techniques were developed and successfully demonstrated for the recovery of Mo/Be-coated optics as well as for Mo/Si-coated optics when Mo/Be release layers were employed; however, there are questions about the extendability of the HCl process to large optics and multiple coat and strip cycles. The technique of using carbon barrier layers to protect the optic during removal of Mo/Si in HF:HNO(3) also showed promise. PMID:18356974

  15. Ceramic-silicide composites

    SciTech Connect

    Petrovic, J.J.

    1998-12-01

    The area of ceramic-silicide composites represents a merging of structural ceramics and structural silicides. Such ceramic-silicide composites can possess the desirable characteristics of both classes of compounds. Important structural ceramics are materials such as Si{sub 3}N{sub 4}, SiC, Al{sub 2}O{sub 3}, and ZrO{sub 2}, which possess covalent, ionic, or mixed covalent-ionic atomic bonding. An important structural silicide is MoSi{sub 2}, which possesses mixed covalent-metallic bonding. The arena of ceramic-silicide composites encompasses both composites where the structural silicide is the matrix and the structural ceramic is the reinforcement, and composites where the structural ceramic is the matrix and the structural silicide is the reinforcement. In the former area, MoSi{sub 2}-SiC, MoSi{sub 2}-ZrO{sub 2}, and MoSi{sub 2}-Al{sub 2}O{sub 3} composites are discussed. In the latter area, Si{sub 3}N{sub 4}-MoSi{sub 2} composites are described.

  16. Synthesis and design of silicide intermetallic materials

    SciTech Connect

    Petrovic, J.J.; Castro, R.G.; Butt, D.P.

    1997-04-01

    The overall objective of this program is to develop structural silicide-based materials with optimum combinations of elevated temperature strength/creep resistance, low temperature fracture toughness, and high temperature oxidation and corrosion resistance for applications of importance to the U.S. processing industry. A further objective is to develop silicide-based prototype industrial components. The ultimate aim of the program is to work with industry to transfer the structural silicide materials technology to the private sector in order to promote international competitiveness in the area of advanced high temperature materials and important applications in major energy-intensive U.S. processing industries. The program presently has a number of developing industrial connections, including a CRADA with Schuller International Inc. targeted at the area of MoSi{sub 2}-based high temperature materials and components for fiberglass melting and processing applications. The authors are also developing an interaction with the Institute of Gas Technology (IGT) to develop silicides for high temperature radiant gas burner applications, for the glass and other industries. Current experimental emphasis is on the development and characterization of MoSi{sub 2}-Si{sub 3}N{sub 4} and MoSi{sub 2}-SiC composites, the plasma spraying of MoSi{sub 2}-based materials, and the joining of MoSi{sub 2} materials to metals.

  17. Assessment of processing routes and strength of a 3-phase molybdenum boron silicide (Mo{sub 5}Si{sub 3}-Mo{sub 5}SiB{sub 2}-Mo{sub 3}Si)

    SciTech Connect

    Schneibel, J.H.; Liu, C.T.; Heatherly, L.; Kramer, M.J.

    1998-03-03

    High temperature components such as furnace elements are often fabricated from MoSi{sub 2}. Molybdenum boron silicides consisting of Mo{sub 5}Si{sub 3}, Mo{sub 3}Si, and Mo{sub 5}SiB{sub 2} are an interesting alternative to MoSi{sub 2}. At present, the mechanical properties of these new Mo-Si-B intermetallics have not been fully explored. One reason for this is simply the unavailability of sufficiently large parts with a sound microstructure. The goal of this work was therefore to explore the processing of these materials by several different routes such as powder and ingot metallurgy, and examine the resulting microstructures. In addition, some post-processing (hot isostatic forging, extrusion) was carried out. The flexure strength of the differently processed materials was characterized and interpreted in terms of their microstructures.

  18. Method for characterizing mask defects using image reconstruction from X-ray diffraction patterns

    DOEpatents

    Hau-Riege, Stefan Peter

    2007-05-01

    The invention applies techniques for image reconstruction from X-ray diffraction patterns on the three-dimensional imaging of defects in EUVL multilayer films. The reconstructed image gives information about the out-of-plane position and the diffraction strength of the defect. The positional information can be used to select the correct defect repair technique. This invention enables the fabrication of defect-free (since repaired) X-ray Mo--Si multilayer mirrors. Repairing Mo--Si multilayer-film defects on mask blanks is a key for the commercial success of EUVL. It is known that particles are added to the Mo--Si multilayer film during the fabrication process. There is a large effort to reduce this contamination, but results are not sufficient, and defects continue to be a major mask yield limiter. All suggested repair strategies need to know the out-of-plane position of the defects in the multilayer.

  19. The analysis and minimization of oxygen contamination in the powder processing of molybdenum disilicide

    SciTech Connect

    Shannon, K.

    1994-04-24

    Problems with MoSi{sub 2} include low-temperature fracture toughness, high-temperature creep resistance, and ``pest`` phenomena. Oxygen introduced by powder processing may be the cause of some of these problems. This study led to the following conclusions: Supplied powders have significant oxygen present prior to processing (up to 2.5 %), in the form of silica on the surface. This oxygen contamination did not increase by exposure to air at room temperature. An improved powder processing method was developed that uses glass encapsulation. Analysis of microstructures created from powders that contained 4900 to 24,100 ppM oxygen showed that the silica was transferred to the fully dense MoSi{sub 2} as SiO{sub 2} inclusions. A method of producing MoSi{sub 2} with less oxygen was attempted.

  20. YIELD STRESS ANOMALIES, DISLOCATION CORE STRUCTURES AND SUBSTITUTIONAL ALLOYING IN MOLYBDENUM DISILICIDE

    SciTech Connect

    A. MISRA; T. MITCHELL; M. BASKES; ET AL

    2001-05-01

    A brief overview of the temperature dependence of yield strength for the different slip systems of MoSi{sub 2} is presented and mechanisms for the yield stress anomaly are discussed. Recent results on the atomistic simulation of the dislocation core structures and mobility are presented next. Finally, we present experimental results on substitutional alloying of polycrystalline MoSi{sub 2} with 1-2 at.% Re, Nb and Al. Re resulted in an order of magnitude increase in compressive strength at 1600 C, Al caused solution softening at near-ambient temperatures, and Nb caused softening at low temperatures and hardening at high temperatures. The quaternary MoSi{sub 2}-Re-Al alloys showed strengthening at elevated temperatures and reduction in flow stress with enhanced plasticity at near-ambient temperatures. The mechanisms of solution hardening and softening are discussed using insight from transmission electron microscopy observations of the dislocation substructures and atomistic simulation results.

  1. Synthesis and design of intermetallic materials - molybdenum disilicide

    SciTech Connect

    Petrovic, J.J.; Castro, R.G.; Butt, D.P.

    1995-05-01

    The objective of this program is to develop structural silicide-based composite materials with optimum combinations of elevated temperature strength/creep resistance, low temperature fracture toughness, and high temperature oxidation resistance for applications of importance to the U.S. processing industry. A further objective is to develop silicide-based prototype industrial components. The ultimate aim of the program is to work with industry to transfer the structural silicide materials technology to the private sector in order to promote international competitiveness in the area of advanced high temperature composite materials and important applications in major energy-intensive U.S. processing industries. The program presently has a number of developing industrial connections, including a CRADA with the advanced materials company Advanced Refractory Technologies Inc. and interactions targeted at developing industrial gas burner and metal and glass melting/processing applications. Current experimental emphasis is on the development and characterization of SiC reinforced-MoSi{sub 2} matrix composites, plasma sprayed MoSi{sub 2}-based materials and microlaminate composites, and MoSi{sub 2} reinforced-Si{sub 3}N{sub 4} matrix composites. We are developing processing methods for MoSi{sub 2{minus}}based materials and microlaminate composites, and MoSi{sub 2} reinforced-Si{sub 3}N{sub 4} matrix composites. We are developing processing methods for MoSi{sub 2{minus}} based materials, such as plasma spraying/spray forming and electrophoretic deposition. We are also pursuing the fabrication of prototype industrial gas burner and injection tube components of these materials, as well as prototype components for glass processing.

  2. Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application

    DOEpatents

    Barbee, Jr., Troy W.; Bajt, Sasa

    2002-01-01

    The reflectivity and thermal stability of Mo/Si (molybdenum/silicon) multilayer films, used in soft x-ray and extreme ultraviolet region, is enhanced by deposition of a thin layer of boron carbide (e.g., B.sub.4 C) between alternating layers of Mo and Si. The invention is useful for reflective coatings for soft X-ray and extreme ultraviolet optics, multilayer for masks, coatings for other wavelengths and multilayers for masks that are more thermally stable than pure Mo/Si multilayers

  3. Silicon-nitride and metal composite

    DOEpatents

    Landingham, Richard L.; Huffsmith, Sarah A.

    1981-01-01

    A composite and a method for bonding the composite. The composite includes a ceramic portion of silicon nitride, a refractory metal portion and a layer of MoSi.sub.2 indirectly bonding the composite together. The method includes contacting the layer of MoSi.sub.2 with a surface of the silicon nitride and with a surface of the metal; heating the layer to a temperature below 1400.degree. C.; and, simultaneously with the heating, compressing the layer such that the contacting is with a pressure of at least 30 MPa. This composite overcomes useful life problems in the fabrication of parts for a helical expander for use in power generation.

  4. Atomistic Potentials for the Molybdenum-Silicon System

    SciTech Connect

    M. I. Baskes

    1998-11-01

    Using a modified version of the Embedded Atom Method (EAM) that includes angular forces, potentials are developed for the Mo/Si system. Previously developed potentials for Mo and Si are used. The cross potential is fit to properties of MoSi2, Mo3Si, and Mo5Si3. Predictions are presented for phase stability, lattice constants, elastic constants, and point and planar defect energies. In general the agreement with experiment is good, but the predicted lattice constants are somewhat greater than experiment.

  5. Phenomenological study of the behavior of some silica formers in a high velocity jet fuel burner

    NASA Technical Reports Server (NTRS)

    Cawley, J. D.; Handschuh, R. F.

    1985-01-01

    Samples of four silica formers: single crystal SiC, sintered alpha-SiC, reaction sintered Si3N4 and polycrystalline MoSi2, were subjected to a Mach 1 jet fuel burner for 1 hr, at a sample temperature of 1375 deg C (2500 deg F). Two phenomena were identified which may be deleterious to a gas turbine application of these materials. The glass layer formed on the MoSi2 deformed appreciably under the aerodynamic load. A scale developed on the samples of the other materials which consisted of particular matter from the gas stream entrapped in a SiO2 matrix.

  6. Method and apparatus for detecting the presence and thickness of carbon and oxide layers on EUV reflective surfaces

    DOEpatents

    Malinowski, Michael E.

    2005-01-25

    The characteristics of radiation that is reflected from carbon deposits and oxidation formations on highly reflective surfaces such as Mo/Si mirrors can be quantified and employed to detect and measure the presence of such impurities on optics. Specifically, it has been shown that carbon deposits on a Mo/Si multilayer mirror decreases the intensity of reflected HeNe laser (632.8 nm) light. In contrast, oxide layers formed on the mirror should cause an increase in HeNe power reflection. Both static measurements and real-time monitoring of carbon and oxide surface impurities on optical elements in lithography tools should be achievable.

  7. Silicon-nitride and metal composite

    DOEpatents

    Landingham, R.L.; Huffsmith, S.A.

    A composite and a method for bonding the composite are described. The composite includes a ceramic portion of silicon nitride, a refractory metal portion and a layer of MoSi/sub 2/ indirectly bonding the composite together. The method includes contacting the layer of MoSi/sub 2/ with a surface of the silicon nitride and with a surface of the metal; heating the layer to a temperature below 1400/sup 0/C; and, simultaneously, compressing the layer such that the contacting is with a pressure of at least 30 MPa. This composite overcomes useful life problems in the fabrication of parts for a helical expander for use in power generation.

  8. Thin film molybdenum silicide as potential temperature sensors for turbine engines

    NASA Technical Reports Server (NTRS)

    Ho, C. H.; Prakash, S.; Deshpandey, C. V.; Doerr, H. J.; Bunshah, R. F.

    1989-01-01

    Temperature measurements of Mo-Si-based thin-film resistance thermometers were studied. Annealing in an argon ambient at a temperature above 1000 C for at least 1 h is required to form the stable tetragonal MoSi2 phase. With a crack-free 2-micron-thick AlN barrier layer on top, a sensor was tested up to 1200 C. The resistivity vs temperature characteristic shows the room temperature resistivity and temperature coefficient of resistivity (TCR) of the sensor to be approximately 350 microohm and 0.01195 K, respectively. No film adhesion problems were observed for at least four testing cycles.

  9. Recovery of EUVL substrates

    SciTech Connect

    Vernon, S.P.; Baker, S.L.

    1995-01-19

    Mo/Si multilayers, were removed from superpolished zerodur and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.

  10. Porous acicular mullite obtained by controlled oxidation of waste molybdenum disilicide

    SciTech Connect

    Bučevac, Dušan; Dapčević, Aleksandra; Maksimović, Vesna

    2014-02-01

    Highlights: • Waste MoSi{sub 2} heating elements were used as starting material for fabrication of porous acicular mullite. • Calcined MoSi{sub 2} powder was source of SiO{sub 2} and pore former at the same time. • Porous acicular mullite is promising material for filtration of diesel engine exhaust. • Samples with decent mechanical integrity and porosity of more than 60% were fabricated. - Abstract: Porous acicular mullite was fabricated by using waste MoSi{sub 2} heating element and Al{sub 2}O{sub 3}. Careful calcination of the pulverized heating element led to the formation of a mixture of MoO{sub 3} and amorphous SiO{sub 2}. This mixture was employed as both SiO{sub 2} precursor and pore former. The oxidation of MoSi{sub 2} and mullite formation were studied. The effect of fabrication temperature on phase composition, porosity, grain morphology, and compressive strength of sintered mullite was examined. Pure mullite with porosity of more than 60% and compressive strength of ∼20 MPa was obtained at temperature as low as 1300 °C. The microstructure consisted of elongated, rectangular, prism-like grains which are known to be effective in filtration of diesel engine exhaust. The increase in sintering temperature caused the change of grain morphology and reduction in compressive strength.

  11. Photomask repair technology by using gas field ion source

    NASA Astrophysics Data System (ADS)

    Aramaki, Fumio; Kozakai, Tomokazu; Matsuda, Osamu; Takaoka, Osamu; Sugiyama, Yasuhiko; Oba, Hiroshi; Aita, Kazuo; Yasaka, Anto

    2012-06-01

    Recently, most of defects on high-end masks are repaired with electron beam (EB). The minimum repairable dimension of the current state-of-the-art repair systems is about 20-30 nm, but that dimension is not small enough to repair the next generation masks. Meanwhile, new molybdenum silicide (MoSi) films with high cleaning durability are going to be provided for an alternative technology, but the etching selectivity between new MoSi and quartz under EB repair process is not high enough to control etching depth. We developed the focused ion beam (FIB) technology that uses light ions emitted from a gas field ion source (GFIS). In this study, the performance of our developed GFIS mask repair system was investigated by using new MoSi (HOYA-A6L2). Specifically, the minimum repairable dimension, image resolution, imaging damage, etching material selectivity and through-focus behavior on AIMS were evaluated. The minimum repairable dimension was only 11 nm that is nearly half of that with EB. That result suggests that GFIS technology is a promising candidate for repairing the next generation masks. Meanwhile, the etching selectivity between A6L2 and quartz was 6:1. Additionally, the other evaluations on AIMS showed good results. Those results demonstrate that GFIS technology is a reliable solution of repairing new MoSi masks with high cleaning durability.

  12. Molybdenum disilicide composites produced by plasma spraying

    SciTech Connect

    Castro, R.G.; Hollis, K.J.; Kung, H.H.; Bartlett, A.H.

    1998-05-25

    The intermetallic compound, molybdenum disilicide (MoSi{sub 2}) is being considered for high temperature structural applications because of its high melting point and superior oxidation resistance at elevated temperatures. The lack of high temperature strength, creep resistance and low temperature ductility has hindered its progress for structural applications. Plasma spraying of coatings and structural components of MoSi{sub 2}-based composites offers an exciting processing alternative to conventional powder processing methods due to superior flexibility and the ability to tailor properties. Laminate, discontinuous and in situ reinforced composites have been produced with secondary reinforcements of Ta, Al{sub 2}O{sub 3}, SiC, Si{sub 3}N{sub 4} and Mo{sub 5}Si{sub 3}. Laminate composites, in particular, have been shown to improve the damage tolerance of MoSi{sub 2} during high temperature melting operations. A review of research which as been performed at Los Alamos National Laboratory on plasma spraying of MoSi{sub 2}-based composites to improve low temperature fracture toughness, thermal shock resistance, high temperature strength and creep resistance will be discussed.

  13. Development of Metallic Magnetic Calorimeters with a Critical Temperature Switch

    NASA Astrophysics Data System (ADS)

    Kim, S. R.; Choi, J.; Jo, H. S.; Kang, C. S.; Kim, G. B.; Kim, H. L.; Kim, I. W.; Lee, H. J.; Lee, J. H.; Lee, M. K.; Oh, S. Y.; Sala, E.; So, J. H.; Yoon, W. S.; Kim, Y. H.

    2016-07-01

    We report on the progress in the development of meander-shaped metallic magnetic calorimeters (MMCs) with a critical temperature switch. A niobium meander-shaped coil in an MMC is arranged to form a superconducting loop. It is to measure the change in magnetization and to apply a persistent current that magnetizes the MMC sensor material. In this work, part of the superconducting loop is fabricated with another superconducting material with its transition temperature (T_C) lower than that of niobium. A persistent current can be injected in the loop while reducing the temperature from above to below the T_C of the switch. Aluminum (Al) wires and an alloy of molybdenum and germanium (MoGe) were tested as critical temperature switch. The test with the Al switch demonstrated the temperature switch concept for meander-shaped MMCs that require a large field current. Microfabricated MoGe switches showed a T_C near 4.3 K, but only 7 mA of persistent current could be charged due to MoGe film discontinuity. This issue requires further improvement in the fabrication procedure.

  14. Phase identification in reactive sintering of molybdenum disilicide composites

    SciTech Connect

    Alba, J. Jr.

    1996-10-01

    Molybdenum disilicide has been predominantly used for furnace heating elements, but recently there has been interest in its use for high temperature structural applications. The reason for this increased interest stems from its desirable characteristics which are a high melting point, relatively low density, good oxidation resistance, relatively good thermal conductivity and electronically conductive. The melting point of MoSi{sub 2} is approximately 2030{degrees}C as compared to a melting point of 1340{degrees}C for the Ni-based superalloys. This could potentially give MoSi{sub 2} a big advantage over the Ni-based superalloys in turbine applications because the operating temperature can be increased resulting in an increase in turbine efficiency and reduced emissions. The relatively low density (6.25g/cm{sup 3}) compared to the Ni-based superalloys (8.9 g/cm{sup 3}) is an important advantage in turbine applications because of the need for low weight. Good oxidation resistance stems from the ability of MoSi{sub 2} to form a protective SiO{sub 2} surface layer when exposed to oxygen. Another advantageous feature of MoSi{sub 2} is its thermal conductivity which is superior to Ni-based superalloys at low temperatures and comparable to the Ni-based superalloys at high temperatures. This allows heat to be dissipated at a rate better than ceramics and comparable to metals. MoSi{sub 2} is electrically conductive allowing it to be electro discharge machined. This is desirable since conventional ceramics are not generally conductive and cannot be electro discharge machined.

  15. Raman study of phase transformation from diamond structure to wurtzite structure in the silicon nanowires

    NASA Astrophysics Data System (ADS)

    Shukla, A. K.; Dixit, Saurabh

    2016-07-01

    Hexagonal silicon has emerged as an exciting material due to its novel vibrational and electronic properties. Synthesis of the wurtzite silicon nanowires (w-SiNWs) is studied here using metal assisted chemical etching (MACE) technique. Stress induced in the SiNWs during wet chemical etching is attributed to formation of the w-SiNWs. Presence of the w-SiNWs is revealed by first-order and second-order Raman spectra. The effect of variation of deposition time of silver (catalyst) is explicitly studied for growth of w-SiNWs. The deposition time enhances the density of SiNWs in an island of vertically aligned SiNWs. Absorption coefficient studies of the w-SiNWs are also conducted using UV–vis spectroscopy as a function of deposition time. Increase in the absorption coefficient in SiNWs is noticed with increasing deposition time. The prominent quantum confinement along with stress and porosity is shown to be mainly responsible for the transformation from diamond structure to wurtzite structure in the silicon nanowires.

  16. Tensile property of a hot work tool steel prepared by biomimetic coupled laser remelting process with different laser input energies

    NASA Astrophysics Data System (ADS)

    Wang, Chuanwei; Zhou, Hong; Zhang, Zhihui; Zhao, Yu; Zhang, Peng; Cong, Dalong; Meng, Chao; Tan, Fuxing

    2012-09-01

    Coupled with the biomimetic principle, a hot work tool steel (4Cr5MoSiV1) was manufactured using a laser with different input energies. Results of tensile tests confirmed that the biomimetic coupled laser remelting (BCLR) process had an advance effect on improving the strength and ductility of 4Cr5MoSiV1 steel simultaneously. Microstructure examinations demonstrated that a fine microstructure along with nano scale carbide was acquired in the BCLR units, which produced an accumulative contribution of grain refinement, precipitation strengthening and a mixed microstructure. Based on the well distribution of the BCLR units, the beneficial effect of stress transfer from the matrix to the units on tensile property was also analyzed.

  17. X-ray photoelectron spectroscopy study of radiofrequency-sputtered refractory compound steel interfaces

    NASA Technical Reports Server (NTRS)

    Wheeler, D. R.; Brainard, W. A.

    1978-01-01

    Radiofrequency sputtering was used to deposit Mo2C, Mo2B5, and MoSi2 coatings on 440C steel substrates. Both sputter etched and preoxidized substrates were used, and the films were deposited with and without a substrate bias of -300 V. The composition of the coatings was measured as a function of depth by X-ray photoelectron spectroscopy combined with argon ion etching. In the interfacial region there was evidence that bias produced a graded interface in Mo2B5 but not in Mo2C. Oxides of iron and of all film constituents except carbon were presented in all cases but the iron oxide concentration was higher and the layer thicker on the preoxidized substrates. The film and iron oxides were mixed in the MoSi2 and Mo2C films but layered in the Mo2B5 film. The presence of mixed oxides correlates with enhanced film adhesion.

  18. Ab Initio Calculated Thermodynamic Properties of Mo5SiB2 Phase and Nb5SiB2 Phase

    NASA Astrophysics Data System (ADS)

    Kim, Sungtae; Park, J. S.

    2013-11-01

    Due to their attractive high-temperature properties, multiphase Mo-Si-B alloys in the Mo-rich Mo-Si-B ternary system have been identified for high-temperature applications. The ternary intermetallic T2 (Mo5SiB2) phase is a central feature of the phase equilibria within this ternary system. Experimental stability analyses of the T2 phase shows its broad homogeneous composition ranges that can yield a constitutional defect structure such as vacancies for Mo-rich compositions and antisite defects for Mo-lean compositions. Previous thermodynamic model did not conform to the defect structures as reported in experiments, and thus subsequently a new sublattice thermodynamic model for the T2 phase is initiated in this study. To support the new sublattice thermodynamic model, ab initio calculations were implemented to compute formation energy data. The calculated formation energy data explain a source for broad compositional homogeneity range of T2 structure.

  19. Influence of polar distribution on piezoelectric response of aluminum nitride thin films

    SciTech Connect

    Kamohara, Toshihiro; Akiyama, Morito; Kuwano, Noriyuki

    2008-03-03

    The authors have investigated the influence of the crystal orientation and the polar distribution on the piezoelectric response of aluminum nitride (AlN) thin films prepared on Si, Mo/Si, and Mo/AlN-interlayer (IL)/Si substrates with increasing sputtering power. The crystal orientation of films prepared on Si improves with increasing sputtering power. On the other hand, the crystal orientation of films prepared on Mo/Si and Mo/AlN-IL/Si hardly changes. However, the piezoelectric response of all the films drastically changes from negative to positive values and the predominant polarity changes from N polarity to Al polarity. We found the proportional relationship between the polar distribution and piezoelectric response.

  20. Soft X-Ray Optics by Pulsed Laser Deposition

    NASA Technical Reports Server (NTRS)

    Fernandez, Felix E.

    1996-01-01

    Mo/Si and C/Co multilayers for soft x-ray optics were designed for spectral regions of interest in possible applications. Fabrication was effected by Pulsed Laser Deposition using Nd:YAG (355 nm) or excimer (248 nm) lasers in order to evaluate the suitability of this technique. Results for Mo/Si structures were not considered satisfactory due mainly to problems with particulate production and target surface modification during Si ablation. These problems may be alleviated by a two-wavelength approach, using separate lasers for each target. Results for C/Co multilayers are much more encouraging, since indication of good layering was observed for extremely thin layers. We expect to continue investigating this possibility. In order to compete with traditional PVD techniques, it is necessary to achieve film coverage uniformity over large enough areas. It was shown that this is feasible, and novel means of achieving it were devised.

  1. Hydrogen in titanium alloys

    SciTech Connect

    Wille, G W; Davis, J W

    1981-04-01

    The titanium alloys that offer properties worthy of consideration for fusion reactors are Ti-6Al-4V, Ti-6Al-2Sn-4Zr-2Mo-Si (Ti-6242S) and Ti-5Al-6Sn-2Zr-1Mo-Si (Ti-5621S). The Ti-6242S and Ti-5621S are being considered because of their high creep resistance at elevated temperatures of 500/sup 0/C. Also, irradiation tests on these alloys have shown irradiation creep properties comparable to 20% cold worked 316 stainless steel. These alloys would be susceptible to slow strain rate embrittlement if sufficient hydrogen concentrations are obtained. Concentrations greater than 250 to 500 wppm hydrogen and temperatures lower than 100 to 150/sup 0/C are approximate threshold conditions for detrimental effects on tensile properties. Indications are that at the elevated temperature - low hydrogen pressure conditions of the reactors, there would be negligible hydrogen embrittlement.

  2. Liquid phase reaction-bonding of structural ceramics and composites

    SciTech Connect

    Chiang, Y.M. . Dept. of Materials Science and Engineering)

    1988-01-01

    Synthesis of ceramics via the reaction of a solid precursor with either a gas or liquid phase has a number of advantages compared to conventional sintering technology. These advantages are known for gas-phase processes. The authors have explored the potential for synthesizing high performance ceramics in the model system reaction-bonded silicon carbide, in which liquid silicon is used to infiltrate carbonaceous preforms. In this paper results are presented that illustrate the use of alloyed-melts to obtain dense silicon carbide composites with residual refractory silicide phases, such as MoSi/sub 2/, rather than the residual silicon phase which has heretofore limited high temperature properties. Infiltration processing considerations, such as the ultimate infiltration dimensions possible in the presence of simultaneous reaction, are discussed. Microstructure and mechanical properties characterization in the SIC-MoSi/sub 2/ system are presented. Other refractory ceramics systems to which liquid-phase reaction-bonding may be applied are discussed.

  3. Strength, fracture, and fatigue behavior of advanced high-temperature intermetallics reinforced with ductile phases

    NASA Astrophysics Data System (ADS)

    Soboyejo, W. O.; Rao, K. T. Venkateswara; Sastry, S. M. L.; Ritchie, R. O.

    1993-03-01

    The results of recent studies on the fatigue and fracture behavior of extruded Ti-48A1 + 20 vol pct TiNb and hot-isostatically pressed (“hipped”) MoSi2 + 20 vol pct Nb are presented (compositions in atomic percent unless stated otherwise). The effects of ductile phase reinforcement of Ti-48A1 and MoSi2 on the micromechanisms of fracture under monotonie and cyclic loading are elucidated. Micromechanics models are applied to the prediction of crack-tip shielding components, and the effects of temperature on tensile/compressive/flexure strengths are discussed. Ductile phase toughening under monotonie loading conditions is shown to be associated with lower fatigue crack growth resistance. The lower fatigue resistance is attributed to the absence of crack-tip shielding, higher crack opening displacements, and the effects of inelastic strains that are developed in ductile phase-reinforced composites under cyclic loading conditions.

  4. Heat treatment giving a stable high temperature micro-structure in cast austenitic stainless steel

    DOEpatents

    Anton, Donald L.; Lemkey, Franklin D.

    1988-01-01

    A novel micro-structure developed in a cast austenitic stainless steel alloy and a heat treatment thereof are disclosed. The alloy is based on a multicomponent Fe-Cr-Mn-Mo-Si-Nb-C system consisting of an austenitic iron solid solution (.gamma.) matrix reinforced by finely dispersed carbide phases and a heat treatment to produce the micro-structure. The heat treatment includes a prebraze heat treatment followed by a three stage braze cycle heat treatment.

  5. Effect of structure and deposition technology on tribological properties of DLC coatings alloyed with VIA group metals

    NASA Astrophysics Data System (ADS)

    Khrushchov, M.; Levin, I.; Marchenko, E.; Avdyukhina, V.; Petrzhik, M.

    2016-07-01

    The results of a comprehensive research on atomic structure, phase composition, micromechanical and tribological characteristics of alloyed DLC coatings have been presented. The coatings have been deposited by reactive magnetron sputtering in acetylene-nitrogen gas mixtures of different compositions (a-C:H:Cr), by plasma-assisted chemical vapor deposition in atmospheres of silicone-organic precursor gases (a-C:H:Mo:Si), and by nonreactive magnetron sputtering of a composite target (a-C:H:W).

  6. Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

    SciTech Connect

    Jody Corso, Alain; Nicolosi, Piergiorgio; Nardello, Marco; Guglielmina Pelizzo, Maria; Department of Information Engineering, University of Padova, via Gradenigo 6 Zuppella, Paola; Barkusky, Frank; KLA-Tencor, 5 Technology Dr., Milpitas, California 95035 ; Mann, Klaus; Mueller, Matthias

    2013-05-28

    Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneath.

  7. Powerful 170-attosecond XUV pulses generated with few-cycle laser pulses and broadband multilayer optics

    NASA Astrophysics Data System (ADS)

    Schultze, M.; Goulielmakis, E.; Uiberacker, M.; Hofstetter, M.; Kim, J.; Kim, D.; Krausz, F.; Kleineberg, U.

    2007-07-01

    Single 170-as extreme ultraviolet (XUV) pulses delivering more than 106 photons/pulse at ~100 eV at a repetition rate of 3 kHz are produced by ionizing neon with waveform-controlled sub-5 fs near-infrared (NIR) laser pulses and spectrally filtering the emerging near-cutoff high-harmonic continuum with a broadband, chirped multilayer molybdenum silicon (Mo/Si) mirror.

  8. Silicide Coating Fabricated by HAPC/SAPS Combination to Protect Niobium Alloy from Oxidation.

    PubMed

    Sun, Jia; Fu, Qian-Gang; Guo, Li-Ping; Wang, Lu

    2016-06-22

    A combined silicide coating, including inner NbSi2 layer and outer MoSi2 layer, was fabricated through a two-step method. The NbSi2 was deposited on niobium alloy by halide activated pack cementation (HAPC) in the first step. Then, supersonic atmospheric plasma spray (SAPS) was applied to obtain the outer MoSi2 layer, forming a combined silicide coating. Results show that the combined coating possessed a compact structure. The phase constitution of the combined coating prepared by HAPC and SAPS was NbSi2 and MoSi2, respectively. The adhesion strength of the combined coating increased nearly two times than that for single sprayed coating, attributing to the rougher surface of the HAPC-bond layer whose roughness increased about three times than that of the grit-blast substrate. After exposure at 1200 °C in air, the mass increasing rate for single HAPC-silicide coating was 3.5 mg/cm(2) because of the pest oxidation of niobium alloy, whereas the combined coating displayed better oxidation resistance with a mass gain of only 1.2 mg/cm(2). Even more, the combined coating could significantly improve the antioxidation ability of niobium based alloy at 1500 °C. The good oxidation resistance of the combined silicide coating was attributed to the integrity of the combined coating and the continuous SiO2 protective scale provided by the oxidation of MoSi2. PMID:27243944

  9. Evaluation of mask repair strategies via focused electron, helium, and neon beam induced processing for EUV applications

    NASA Astrophysics Data System (ADS)

    Gonzalez, C. M.; Slingenbergh, W.; Timilsina, R.; Noh, J.-H.; Stanford, M. G.; Lewis, B. B.; Klein, K. L.; Liang, T.; Fowlkes, J. D.; Rack, P. D.

    2014-04-01

    One critical area for EUV lithography is the development of appropriate mask repair strategies. To this end, we have explored etching repair strategies for nickel absorber layers and focused electron beam induced deposition of ruthenium capping layers. Nickel has higher EUV absorption than the standard TaN absorber layer and thus thinner films and improved optical quality can be realized. A thin (2.5 nm) ruthenium film is commonly used as a protective capping layer on the Mo-Si EUV multi-layer mirror which mechanically and chemically protects the multi-layers during standard mask-making procedures. The gas field ion (GFIS) microscope was used to investigate helium and neon ion beam induced etching (IBIE) of nickel as a candidate technique for EUV lithography mask editing. No discernable nickel etching was observed for helium, however transmission electron microscopy (TEM) revealed subsurface damage to the underlying Mo-Si multilayers. Subsequently, neon beam induced etching at 30 keV was investigated and successfully removed the 50 nm nickel absorber film. TEM imaging also revealed subsurface damage in the underlying Mo-Si multilayer. Two damage regimes were apparent, namely: 1) beam induced mixing of the Mo-Si layers and 2) nanobubble formation. Monte Carlo simulations were performed and the observed damage regimes were correlated to: 1) the nuclear energy loss and 2) a critical implant concentration. Electron beam induced deposition (EBID) was explored to deposit ruthenium capping/protective layers. Several ruthenium precursors were screened and so far liquid bis(ethylcyclopentyldienyl)ruthenium(II) was successful. The purity of the as-deposited nanodeposits was estimated to be 10% Ru and 90% C. We demonstrate a new chemically assisted electron beam purification process to remove carbon by-products and show that high-fidelity nanoscale ruthenium repairs can be realized.

  10. Microstructure of hot-pressed Al2O3-Si3N4 mixtures as a function of holding temperature

    NASA Technical Reports Server (NTRS)

    Yeh, H. C.

    1976-01-01

    Powder mixtures of 40 m/o Si3N4-60 m/o Al2O3 were hot-pressed at 4000 psi at various holding temperatures from 1100 C to 1700 C. Scanning Electron Microscopy and Transmission Electro Microscopy results were correlated to X-ray phase analysis and density measurements. The progressively developed microstructure was used to interpret the densification behavior of SiAlON. Photomicrographs of microstructures are shown.

  11. Plasma-materials interaction results at Sandia National Laboratories.

    SciTech Connect

    Causey, Rion A.; Wampler, William R.; Buchenauer, Dean A.; Karnesky, Richard A.; Whaley, Josh A.; Cowgill, Donald F.; Kolasinski, Robert D.

    2010-08-01

    Overview of Plasma Materials Interaction (PMI) activities are: (1) Hydrogen diffusion and trapping in metals - (a) Growth of hydrogen precipitates in tungsten PFCs, (b) Temperature dependence of deuterium retention at displacement damage, (c) D retention in W at elevated temperatures; (2) Permeation - (a) Gas driven permeation results for W/Mo/SiC, (b) Plasma-driven permeation test stand for TPE; and (3) Surface studies - (a) H-sensor development, (b) Adsorption of oxygen and hydrogen on beryllium surfaces.

  12. Diffraction-limited soft-x-ray projection imaging using a laser plasma source

    SciTech Connect

    Tichenor, D.A.; Kubiak, G.D.; Malinowski, M.E.; Stulen, R.H.; Haney, S.J.; Berger, K.W.; Brown, L.A. ); Freeman, R.R.; Mansfield, W.M.; Wood, O.R. II; Tennant, D.M.; Bjorkholm, J.E.; MacDowell, A.A. ); Bokor, J.; Jewell, T.E.; White, D.L.; Windt, D.L.; Waskiewicz, W.K. )

    1991-10-15

    Projection imaging of 0.1-{mu}m lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist and reactive ion etching. Low-contrast modulation at 0.05-{mu}m lines and spaces is observed in polymethylmethacrylate.

  13. Spectroscopic characterization of novel multilayer mirrors intended for astronomical and laboratory applications

    NASA Astrophysics Data System (ADS)

    Ragozin, Eugene N.; Mednikov, Konstantin N.; Pertsov, Andrei A.; Pirozhkov, Alexander S.; Reva, Anton A.; Shestov, Sergei V.; Ul'yanov, Artem S.; Vishnyakov, Eugene A.

    2009-05-01

    We report measurements of the reflection spectra of (i) concave (spherical and parabolic) Mo/Si, Mg/Si, and Al/Zr multilayer mirrors (MMs) intended for imaging solar spectroscopy in the framework of the TESIS/CORONAS-FOTON Satellite Project and of (ii) an aperiodic Mo/Si MM optimized for maximum uniform reflectivity in the 125-250 Å range intended for laboratory applications. The reflection spectra were measured in the configuration of a transmission grating spectrometer employing the radiation of a tungsten laser-driven plasma as the source. The function of detectors was fulfilled by backside-illuminated CCDs coated with Al or Zr/Si multilayer absorption filters. High-intensity second-order interference reflection peaks at wavelengths of about 160 Å were revealed in the reflection spectra of the 304-Å Mo/Si MMs. By contrast, the second-order reflection peak in the spectra of the new-generation narrow-band (~12 Å FWHM) 304-Å Mg/Si MMs is substantially depressed. Manifestations of the NEXAFS structure of the L2, 3 absorption edges of Al and Al2O3 were observed in the spectra recorded. The broadband Mo/Si MM was employed as the focusing element of spectrometers in experiments involving (i) the charge exchange of multiply charged ions with the donor atoms of a rare-gas jet; (ii) the spectroscopic characterization of a debris-free soft X-ray radiation source excited by Nd laser pulses in a Xe jet (iii) near-IR-to-soft-X-ray frequency conversion (double Doppler effect) occurring in the retroreflection from the relativistic electron plasma wake wave (flying mirror) driven by a multiterawatt laser in a pulsed helium jet.

  14. Measurement and modeling of residual stress in net-shape plasma sprayed tubes

    SciTech Connect

    Bartlett, A.; Castro, R.G.

    1996-09-01

    Residual stresses in net-shaped plasma sprayed MoSi{sub 2} tubes were measured by x-ray microdiffraction as a function of radial position in the sample. A tensile to compressive hoop stress profile was measured, ranging 200 MPa in tension at the outer diameter, to -125 MPa at the inner. A force balance model was used to explain the evolution of stresses when incrementally adding layers to the pre-existent material.

  15. Method to adjust multilayer film stress induced deformation of optics

    DOEpatents

    Spiller, Eberhard A.; Mirkarimi, Paul B.; Montcalm, Claude; Bajt, Sasa; Folta, James A.

    2000-01-01

    Stress compensating systems that reduces/compensates stress in a multilayer without loss in reflectivity, while reducing total film thickness compared to the earlier buffer-layer approach. The stress free multilayer systems contain multilayer systems with two different material combinations of opposite stress, where both systems give good reflectivity at the design wavelengths. The main advantage of the multilayer system design is that stress reduction does not require the deposition of any additional layers, as in the buffer layer approach. If the optical performance of the two systems at the design wavelength differ, the system with the poorer performance is deposited first, and then the system with better performance last, thus forming the top of the multilayer system. The components for the stress reducing layer are chosen among materials that have opposite stress to that of the preferred multilayer reflecting stack and simultaneously have optical constants that allow one to get good reflectivity at the design wavelength. For a wavelength of 13.4 nm, the wavelength presently used for extreme ultraviolet (EUV) lithography, Si and Be have practically the same optical constants, but the Mo/Si multilayer has opposite stress than the Mo/Be multilayer. Multilayer systems of these materials have practically identical reflectivity curves. For example, stress free multilayers can be formed on a substrate using Mo/Be multilayers in the bottom of the stack and Mo/Si multilayers at the top of the stack, with the switch-over point selected to obtain zero stress. In this multilayer system, the switch-over point is at about the half point of the total thickness of the stack, and for the Mo/Be--Mo/Si system, there may be 25 deposition periods Mo/Be to 20 deposition periods Mo/Si.

  16. Preparation of microspheres by an emulsification-complexation method.

    PubMed

    Kim, Jin-Chul; Song, Myeong-Eun; Lee, Eun-Joo; Park, Seung-Kyu; Rang, Moon-Jeong; Ahn, Ho-Jeong

    2002-04-01

    Microspheres were prepared by complexation of a cationic polymer, polyquaternium-24, and an anionic surfactant, sodium lauryl sulfate (SLS). The cationic polymer solution was emulsified in dimethylsiloxane to give water in silicone emulsion (W/Si), and it was used as a template for the formation of microspheres. The emulsion was dispersed into the SLS solution. In this process, two kinds of droplets, silicone dropletes and microspheres composed of the cationic polymer and SLS, were formed, evidenced by X-ray energy dispersive spectra. The mean diameter of the microspheres was reduced from 105.7 to 64.8 mum as the stirring rate for W/Si preparation increased from 300 to 1000 rpm. It is believed that water droplets in W/Si emulsion, when exposed to SLS solution, could be solidified by the complexation of the cationic polymer and the anionic surfactant. PMID:16290495

  17. Molybdenum silicide based materials and their properties

    SciTech Connect

    Yao, Z.; Stiglich, J.; Sudarshan, T.S.

    1999-06-01

    Molybdenum disilicide (MoSi{sub 2}) is a promising candidate material for high temperature structural applications. It is a high melting point (2030 C) material with excellent oxidation resistance and a moderate density (6.24 g/cm{sup 3}). However, low toughness at low temperatures and high creep rates at elevated temperatures have hindered its commercialization in structural applications. Much effort has been invested in MoSi{sub 2} composites as alternatives to pure molybdenum disilicide for oxidizing and aggressive environments. Molybdenum disilicide-based heating elements have been used extensively in high-temperature furnaces. The low electrical resistance of silicides in combination with high thermal stability, electron-migration resistance, and excellent diffusion-barrier characteristics is important for microelectronic applications. Projected applications of MoSi{sub 2}-based materials include turbine airfoils, combustion chamber components in oxidizing environments, missile nozzles, molten metal lances, industrial gas burners, diesel engine glow plugs, and materials for glass processing. On this paper, synthesis, fabrication, and properties of the monolithic and composite molybdenum silicides are reviewed.

  18. Microstructure and Sliding Wear Behavior of Fe-Based Coatings Manufactured with HVOF and HVAF Thermal Spray Processes

    NASA Astrophysics Data System (ADS)

    Milanti, A.; Matikainen, V.; Bolelli, G.; Koivuluoto, H.; Lusvarghi, L.; Vuoristo, P.

    2016-04-01

    The microstructure and micromechanical behavior of thermally sprayed Fe-based coatings manufactured with high-velocity oxygen fuel (HVOF) and high-velocity air fuel (HVAF) processes were investigated. Fe-Cr-Ni-Si-B-C and Fe-Cr-Ni-Mo-Si-B-C powders were used as the feedstock materials. The coatings showed a highly dense microstructure with near-zero oxidation. The microstructure of the feedstock powders was better retained when sprayed with HVAF process. Differential scanning calorimetry revealed two small exothermic peaks at about 600 °C for the HVOF-sprayed coatings, without any increase in weight in thermogravimetric analysis. It suggested the re-precipitation of carbides that were dissolved during spraying due to the higher particle temperature reported by spray diagnostics system during the HVOF process (≈1800 °C) compared to the HVAF one (≈1400 °C). Micro- and nano-indentations helped to show the difference in inter-lamellar cohesive strength and, in turn, in the particle deposition mechanism. Coatings sprayed with Fe-Cr-Ni-Mo-Si-B-C composition possessed higher sliding wear resistance than that of Fe-Cr-Ni-Si-B-C due to higher nano-hardness. More specifically, HVOF-sprayed Fe-Cr-Ni-Mo-Si-B-C coating showed the largest intra-lamellar hardness, the largest elasticity, and high quality of particle interfaces which resulted in lower sliding wear rate.

  19. Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks

    NASA Astrophysics Data System (ADS)

    Wood, Obert; Wong, Keith; Parks, Valentin; Kearney, Patrick; Meyer-Ilse, Julia; Luong, Vu; Philipsen, Vicky; Faheem, Mohammad; Liang, Yifan; Kumar, Ajay; Chen, Esther; Bennett, Corbin; Fu, Bianzhu; Gribelyuk, Michael; Zhao, Wayne; Mangat, Pawitter; Van der Heide, Paul

    2016-03-01

    Extreme ultraviolet (EUV) lithography with reflective photomasks continues to be a potential patterning technology for high volume manufacturing at the 7 nm technology node and beyond. EUV photomasks with alternative materials to the commonly used Mo/Si multilayer (ML) reflector and patterned Ta-based absorber (both of which are known to require shadow effect corrections and lead to large through-focus pattern placement errors) are being actively explored. Because the reflective bandwidth of a Ru/Si ML is significantly wider than the reflective bandwidth of a Mo/Si ML and the effective reflectance plane in Ru/Si is closer to the ML surface, Ru/Si ML coatings may be viable alternatives to the Mo/Si ML coatings that are commercially available today because they will lead to smaller mask 3D effects. In this paper, increases in the peak reflectivity and the reflective bandwidth of Ru/Si ML reflectors by using B4C interlayers to improve the Ru-Si interfaces are discussed. The conclusions of this paper are supported with the results of both experimental measurements and rigorous simulations.

  20. Microstructure and Sliding Wear Behavior of Fe-Based Coatings Manufactured with HVOF and HVAF Thermal Spray Processes

    NASA Astrophysics Data System (ADS)

    Milanti, A.; Matikainen, V.; Bolelli, G.; Koivuluoto, H.; Lusvarghi, L.; Vuoristo, P.

    2016-06-01

    The microstructure and micromechanical behavior of thermally sprayed Fe-based coatings manufactured with high-velocity oxygen fuel (HVOF) and high-velocity air fuel (HVAF) processes were investigated. Fe-Cr-Ni-Si-B-C and Fe-Cr-Ni-Mo-Si-B-C powders were used as the feedstock materials. The coatings showed a highly dense microstructure with near-zero oxidation. The microstructure of the feedstock powders was better retained when sprayed with HVAF process. Differential scanning calorimetry revealed two small exothermic peaks at about 600 °C for the HVOF-sprayed coatings, without any increase in weight in thermogravimetric analysis. It suggested the re-precipitation of carbides that were dissolved during spraying due to the higher particle temperature reported by spray diagnostics system during the HVOF process (≈1800 °C) compared to the HVAF one (≈1400 °C). Micro- and nano-indentations helped to show the difference in inter-lamellar cohesive strength and, in turn, in the particle deposition mechanism. Coatings sprayed with Fe-Cr-Ni-Mo-Si-B-C composition possessed higher sliding wear resistance than that of Fe-Cr-Ni-Si-B-C due to higher nano-hardness. More specifically, HVOF-sprayed Fe-Cr-Ni-Mo-Si-B-C coating showed the largest intra-lamellar hardness, the largest elasticity, and high quality of particle interfaces which resulted in lower sliding wear rate.

  1. Stacking faults on (001) in transition-metal disilicides with the C11{sub b} structure

    SciTech Connect

    Ito, K.; Nakamoto, T.; Inui, H.; Yamaguchi, M.

    1997-12-31

    Stacking faults on (001) in MoSi{sub 2} and WSi{sub 2} with the C11{sub b} structure have been characterized by transmission electron microscopy (TEM), using their single crystals grown by the floating-zone method. Although WSi{sub 2} contains a high density of stacking faults, only several faults are observed in MoSi{sub 2}. For both crystals, (001) faults are characterized to be of the Frank-type in which two successive (001) Si layers are removed from the lattice, giving rise to a displacement vector parallel to [001]. When the displacement vector of faults is expressed in the form of R = 1/n[001], however, their n values are slightly deviated from the exact value of 3, because of dilatation of the lattice in the direction perpendicular to the fault, which is caused by the repulsive interaction between Mo (W) layers above and below the fault. Matching of experimental high-resolution TEM images with calculated ones indicates n values to be 3.12 {+-} 0.10 and 3.34 {+-} 0.10 for MoSi{sub 2} and WSi{sub 2}, respectively.

  2. Reflective masks for extreme ultraviolet lithography

    SciTech Connect

    Nguyen, Khanh Bao

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 {mu}m wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  3. X-ray multilayer optics for Indus synchrotrons application

    NASA Astrophysics Data System (ADS)

    Nayak, Maheswar; Pradhan, P. C.; Lodha, G. S.

    2015-06-01

    We present the state-of-the-art X-ray multilayer optics fabrication facilities at Indus synchrotrons complex. The facilities are regularly used for fabrication of high quality x-ray multilayer structures. The results on two representative materials combination of Mo/Si and W/B4C are presented. In Mo/Si multilayer system, we have achieved ˜70% of reflectivity (near normal incidence angle) at soft x-ray region. Large area (300mm×50mm) Mo/Si multilayers are also successively fabricated for monochromator application in hard x-ray region. Whereas in W/B4C system, we demonstrate the capability of these facilities to fabricate ultra short period multilayer (periodicity ˜15-20 Å) with large number of layer pairs in the range of 200-400 for transmission polarizer near Fe L-edge and for monochromator application in hard x-ray region. Hard x-ray reflectivity of ˜54% is achieved from W/B4C MLs with periodicity ˜20 Å and number of layer pairs 300.

  4. Nonlinear continuum growth model of multiscale reliefs as applied to rigorous analysis of multilayer short-wave scattering intensity. I. Gratings.

    PubMed

    Goray, Leonid; Lubov, Maxim

    2013-08-01

    It is shown that taking into proper account certain terms in the nonlinear continuum equation of thin-film growth makes it applicable to the simulation of the surface of multilayer gratings with large boundary profile heights and/or gradient jumps. The proposed model describes smoothing and displacement of Mo/Si and Al/Zr boundaries of gratings grown on Si substrates with a blazed groove profile by magnetron sputtering and ion-beam deposition. Computer simulation of the growth of multilayer Mo/Si and Al/Zr gratings has been conducted. Absolute diffraction efficiencies of Mo/Si and Al/Zr gratings in the extreme UV range have been found within the framework of boundary integral equations applied to the calculated boundary profiles. It has been demonstrated that the integrated approach to the calculation of boundary profiles and of the intensity of short-wave scattering by multilayer gratings developed here opens up a way to perform studies comparable in accuracy to measurements with synchrotron radiation, at least for known materials and growth techniques. PMID:24046500

  5. Nonlinear continuum growth model of multiscale reliefs as applied to rigorous analysis of multilayer short-wave scattering intensity. I. Gratings

    PubMed Central

    Goray, Leonid; Lubov, Maxim

    2013-01-01

    It is shown that taking into proper account certain terms in the nonlinear continuum equation of thin-film growth makes it applicable to the simulation of the surface of multilayer gratings with large boundary profile heights and/or gradient jumps. The proposed model describes smoothing and displacement of Mo/Si and Al/Zr boundaries of gratings grown on Si substrates with a blazed groove profile by magnetron sputtering and ion-beam deposition. Computer simulation of the growth of multilayer Mo/Si and Al/Zr gratings has been conducted. Absolute diffraction efficiencies of Mo/Si and Al/Zr gratings in the extreme UV range have been found within the framework of boundary integral equations applied to the calculated boundary profiles. It has been demonstrated that the integrated approach to the calculation of boundary profiles and of the intensity of short-wave scattering by multilayer gratings developed here opens up a way to perform studies comparable in accuracy to measurements with synchrotron radiation, at least for known materials and growth techniques. PMID:24046500

  6. JOINING OF MOLYBDENUM DISILICIDE TO STAINLESS STEEL USING AMORPHOUS METAL BRAZES-RESIDUAL STRESS ANALYSIS

    SciTech Connect

    VAIDYA, RAJENDRA U; KAUTZ, DOUGLAS D.; GALLEGOS, DAVID E.

    2007-01-30

    Molybdenum disilicide (MoSi{sub 2})/stainless steel 316 L jOints were produced by high temperature brazing using a cobalt-based metallic-glass (METGLAS{trademark} 2714A). Successful joining was completed in two different ways; either by feeding excess braze into the braze gap upon heating or by constraining the MoSi{sub 2}/stainiess steel assembly with an alumina (Al{sub 2}O{sub 3}) fixture during the heating cycle. These steps were necessary to ensure the production of a high quality void free joint. Residual stress measurements were completed on these joints. Indentation results show higher tensile residual stresses in the stainless steel for the joint with the external constraint, in comparison to the unconstrained state. In contrast, the compressive residual stresses In the MoSi{sub 2} (as measured by X-ray diffraction) were lower in the constrained state relative to the unconstrained state. These results and a lack of residual stress balance indicate that the stress state in the braze is significantly different under the two joining conditions and the volume of the braze plays an important role in the development of the residual stresses. Push-out tests carried out on these joints gave higher joint strengths in the unconstrained as compared to the constrained condition. The results of this study have important implications on the selection of the appropriate joining process (use of constraint versus extra braze).

  7. Vortex interaction enhanced saturation number and caging effect in a superconducting film with a honeycomb array of nanoscale holes.

    SciTech Connect

    Latimer, M. L.; Berdiyorov, G. R.; Xiao, Z. L.; Kwok, W. K.; Peeters, F. M.

    2012-01-01

    The electrical transport properties of a MoGe thin film with a honeycomb array of nanoscale holes are investigated. The critical current of the system shows nonmatching anomalies as a function of applied magnetic field, enabling us to distinguish between multiquanta vortices trapped in the holes and interstitial vortices located between the holes. The number of vortices trapped in each hole is found to be larger than the saturation number predicted for an isolated hole and shows a nonlinear field dependence, leading to the caging effect as predicted from the Ginzburg-Landau (GL) theory. Our experimental results are supplemented by numerical simulations based on the GL theory.

  8. Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme ultraviolet lithography applications

    SciTech Connect

    Mirkarimi, P.B., LLNL

    1998-02-20

    Due to the stringent surface figure requirements for the multilayer-coated optics in an extreme ultraviolet (EUV) projection lithography system, it is desirable to minimize deformation due to the multilayer film stress. However, the stress must be reduced or compensated without reducing EUV reflectivity, since the reflectivity has a strong impact on the throughput of a EUV lithography tool. In this work we identify and evaluate several leading techniques for stress reduction and compensation as applied to Mo/Si and Mo/Be multilayer films. The measured film stress for Mo/Si films with EUV reflectances near 67.4% at 13.4 nm is approximately - 420 MPa (compressive), while it is approximately +330 MPa (tensile) for Mo/Be films with EUV reflectances near 69.4% at 11.4 nm. Varying the Mo-to-Si ratio can be used to reduce the stress to near zero levels, but at a large loss in EUV reflectance (> 20%). The technique of varying the base pressure (impurity level) yielded a 10% decrease in stress with a 2% decrease in reflectance for our multilayers. Post-deposition annealing was performed and it was observed that while the cost in reflectance is relatively high (3.5%) to bring the stress to near zero levels (i.e., reduce by 1 00%), the stress can be reduced by 75% with only a 1.3% drop in reflectivity at annealing temperatures near 200{degrees}C. A study of annealing during Mo/Si deposition was also performed; however, no practical advantage was observed by heating during deposition. A new non-thermal (athermal) buffer-layer technique was developed to compensate for the effects of stress. Using this technique with amorphous silicon and Mo/Be buffer-layers it was possible to obtain Mo/Be and Mo/Si multilayer films with a near zero net film stress and less than a 1% loss in reflectivity. For example a Mo/Be film with 68.7% reflectivity at 11.4 nm and a Mo/Si film with 66.5% reflectivity at 13.3 nm were produced with net stress values less than 30 MPa.

  9. Advanced thin-film deposition and physical properties of high-temperature and other novel superconducting materials. Annual report, 15 October 1991-31 October 1992

    SciTech Connect

    Beasley, M.R.; Geballe, T.H.; Kapitulnik, A.

    1993-06-03

    Progress under AFOSR Contract F49620-92-C-0004 for the period 15 October 1991 to 31 October 1992 is reported. Important results include studies of the grain boundaries in a-axis oriented high-Tc superconducting 123 YBCO thin films, the study of the vortex properties of high-Tc single crystals of the superconductor 2212 BSCCO and the artificially structured Mo-Ge/Ge quasi-two-dimensional superconductors. The latter provide an outstanding model system for the study of vortices in highly anisotropic superconductors, such at the high-Tc cuprates, without all the attendant difficult materials problems. Progress in the synthesis and study of the so-called infinite layer cuprate SrCuO4 and the normally conducting oxide SrRuO3 of interest as a barrier materials in high-Tc SNS devices are also reported. Finally the authors report the development of advanced approaches to rate control of the cation fluxes in the reactive coevaporation of the high-Tc superconductors.... High-Tc superconductivity, Anisotropic superconductivity, SrCuO4, SrRuO3, Mo-Ge/Ge superconducting multilayers.

  10. Effects of alloying elements on carbon dioxide corrosion in 13% to 20% chromium-containing steels

    SciTech Connect

    Hara, T.; Asahi, H.; Kawakami, A.; Takahashi, A.

    2000-04-01

    Effects of alloying elements on corrosion rates were investigated for 13% to 20% chromium-containing steels in wet carbon dioxide (CO{sub 2}) environments without wet hydrogen sulfide (H{sub 2}S) gas at 150 C to 200 C. Results showed that a reduction in carbon content and an increase in chromium, molybdenum, and nickel content improved CO{sub 2} corrosion resistance. However, corrosion rate was independent of nitrogen content. The combined additions of nickel and copper greatly improved CO{sub 2} corrosion resistance. To satisfy the criteria in which the corrosion rates became < 0.1 mm/y, the nickel content should have been > 1% and copper > 0.5% at 10 C. This level of alloying corresponded to the reduction of the Cr + 1.6% Mo index value by {approximately}6%. In the case at 200 C, nickel content was required at > 4%, and copper content at > 1%. The reason for the improvement of CO{sub 2} corrosion resistance is thought to be the combined additions of nickel and copper that made the corrosion film more stable and more protective. The equation to be satisfied with a corrosion rate < 0.1 mm/y at 180 C in 0.02% C-containing steels was indicated as Cr + 1.6% Mo {ge} 19% (copper-free steels) and Cr + 1.6% Mo {ge} 13% (combined additions of nickel and copper).

  11. Composition of RF-sputtered refractory compounds determined by X-ray photoelectron spectroscopy

    NASA Technical Reports Server (NTRS)

    Wheeler, D. R.; Brainard, W. A.

    1978-01-01

    RF-sputtered coatings of CrB2, MoSi2, Mo2C, TiC, and MoS2 were examined by X-ray photoelectron spectroscopy (XPS). Data on stoichiometry, impurity content, and chemical bonding were obtained. The influences of sputtering target history, deposition time, RF power level, and substrate bias were studied. Significant deviations from stoichiometry and high oxide levels were related to target outgassing. The effect of substrate bias depended on the particular coating material studied.

  12. Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection

    SciTech Connect

    Chai, Kil-Byoung; Bellan, Paul M.

    2013-12-15

    An ultra-fast extreme ultra-violet (EUV) movie camera has been developed for imaging magnetic reconnection in the Caltech spheromak/astrophysical jet experiment. The camera consists of a broadband Mo:Si multilayer mirror, a fast decaying YAG:Ce scintillator, a visible light block, and a high-speed visible light CCD camera. The camera can capture EUV images as fast as 3.3 × 10{sup 6} frames per second with 0.5 cm spatial resolution. The spectral range is from 20 eV to 60 eV. EUV images reveal strong, transient, highly localized bursts of EUV radiation when magnetic reconnection occurs.

  13. Study of the mask materials for PTD process and NTD process in practical ArF immersion lithography

    NASA Astrophysics Data System (ADS)

    Adachi, Takashi; Tani, Ayako; Hayano, Katsuya; Takamizawa, Hideyoshi

    2014-07-01

    In this report, we compared the lithographic performances between the conventional positive tone development (PTD) process and the negative tone development (NTD) process, using the lithography simulation. We selected the MoSi-binary mask and conventional 6% attenuated phase shift mask as mask materials. The lithographic performance was evaluated and compared after applying the optical proximity correction (OPC). The evaluation items of lithographic performance were the aerial image profile, the aerial image contrast, normalized image log slope (NILS), mask error enhancement factor (MEEF), and the bossung curves, etc. The designs for the evaluation were selected the simple contact hole and the metal layer sample design.

  14. Low-cost method for producing extreme ultraviolet lithography optics

    DOEpatents

    Folta, James A.; Montcalm, Claude; Taylor, John S.; Spiller, Eberhard A.

    2003-11-21

    Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

  15. The effect of residual stress on performance of high temperature coatings

    NASA Technical Reports Server (NTRS)

    1972-01-01

    Techniques for measurement of residual stress in MoSi2 coatings and the determination of stress in coatings prepared by metalliding, pack and slurry processes are discussed. The stress level can be determined by stress induced deflections or by X-ray techniques. The deflection method is most direct. It is based on the fact that a thin substrate, coated on one side only, is usually curved at room temperature. The radius of curvature is easily measured and readily related to residual stress.

  16. Rates and mechanisms of optic contamination in the EUV engineering test stand

    NASA Astrophysics Data System (ADS)

    Grunow, Philip A.; Klebanoff, Leonard E.; Graham, Samuel, Jr.; Haney, Steven J.; Clift, W. Miles

    2003-06-01

    The EUV Engineering Test Stand (ETS) is a full field, alpha class Extreme Ultraviolet Lithography (EUVL) tool that has demonstrated the printing of 70 nm resolution scanned images. The tool employs Mo/Si multilayer optics that reflect EUV radiation (13.4nm / 92.5eV) with ~67% peak reflectance per optic. For good reflectivity, many (greater than or equal to 40)Mo/Si layers must be present. Consequently, processes such as plasma induced multilayer erosion, which reduces the number of bilayer pairs on plasma facing optics, need to be understood. Since most materials readily absorb EUV photons, it is important to prevent contamination of mirror surfaces with EUV absorbing material. Contamination can occur by EUV photons "cracking" hydrocarbons or other species absorbed on the optical surfaces. The first ETS condenser component, referred to as C1, is coated with Mo/Si multilayers. Data collected from Mo/Si witness plates placed at the C1 position indicate erosion, using the Xe Laser Produced Plasma (LPP) spray jet, of 1 bilayer per ~15 million shots. Preliminary experiments with a filament jet yielded a significantly higher erosion rate. In the spray jet studies, erosion was found to depend sensitively on the composition of the residual background environment. Addition of low levels, ~7x10-7 Torr, of H2O to the vacuum background produced oxidation of the Si cap, and significantly slowed spray jet induced erosion. Operation of the plasma changed the environment in the Illuminator Chamber from oxidizing to carbonizing, thereby changing the nature of the contamination found environment at the C3 optic which does not view the plasma directly (and therefore does not erode). The change in environment is attributed to plasma induced outgassing of fluorocarbons in the Illuminator. Due to the non zero conductance between the Illuminator and Main Chambers, fluorocarbons were also found in the Main Chamber during Xe LPP operation. RGA data are presented that document the effect

  17. Rates and mechanisms of optic contamination in the EUVL engineering test stand

    NASA Astrophysics Data System (ADS)

    Grunow, Philip A.; Klebanoff, Leonard E.; Graham, Samuel, Jr.; Haney, Steven J.; Clift, W. Miles

    2003-06-01

    The EUV Engineering Test Stand (ETS) is a full-field, alpha-class Extreme Ultraviolet Lithography (EUVL) tool that has demonstrated the printing of 70 nm resolution scanned images. The tool employs Mo/Si multilayer optics that reflect EUV radiation (13.4nm / 92.5eV) with ~67% peak reflectance per optic. For good reflectivity, many (≥40)Mo/Si layers must be present. Consequently, processes such as plasma-induced multilayer erosion, which reduces the number of bilayer pairs on plasma-facing optics, need to be understood. Since most materials readily absorb EUV photons, it is important to prevent contamination of mirror surfaces with EUV absorbing material. Contamination can occur by EUV photons "cracking" hydrocarbons or other species absorbed on the optical surfaces. The first ETS condenser component, referred to as C1, is coated with Mo/Si multilayers. Data collected from Mo/Si witness plates placed at the C1 position indicate erosion, using the Xe Laser Produced Plasma (LPP) spray jet, of 1 bilayer per ~15 million shots. Preliminary experiments with a filament jet yielded a significantly higher erosion rate. In the spray jet studies, erosion was found to depend sensitively on the composition of the residual background environment. Addition of low levels, ~7x10-7 Torr, of H2O to the vacuum background produced oxidation of the Si cap, and significantly slowed spray jet-induced erosion. Operation of the plasma changed the environment in the Illuminator Chamber from oxidizing to carbonizing, thereby changing the nature of the contamination found environment at the C3 optic which does not view the plasma directly (and therefore does not erode). The change in environment is attributed to plasma-induced outgassing of fluorocarbons in the Illuminator. Due to the non-zero conductance between the Illuminator and Main Chambers, fluorocarbons were also found in the Main Chamber during Xe LPP operation. RGA data are presented that document the effect. In the presence of such

  18. Radiation Effect on Microstructural Stability of RERTR Fuel

    SciTech Connect

    J. Gan; D. D. Keiser, Jr.; B. D. Miller; T. R. Allen; D. M. Wachs

    2008-03-01

    Three depleted uranium alloys are successfully cast for the radiation stability studies of the fuel-cladding interaction product using proton irradiation. SEM analysis indicates the presence of the phases of interest: U(Si,Al)3, (U,Mo)(Si,Al)3 and a mixture of UMo2Al20, U6Mo4Al43, and UAl4. Irradiation with 2.6 MeV protons at 200ºC to the doses of 0.1, 1.0 and 3.0 dpa are carried out.

  19. High temperature composites

    NASA Technical Reports Server (NTRS)

    Nathal, M. V.

    1995-01-01

    The purpose of this paper is to review the current state of the development of new composite materials for advanced aircraft engines. The advantages and disadvantages of Ti-base, NiAl-base, and MoSi2-base composites as replacements for today's Ni-base superalloys are discussed from the standpoint of key technical issues, current status, and future directions. Results describing progress in both improved understanding of the mechanisms of deformation and fracture, and improved material performance will be covered.

  20. Depth-resolved soft x-ray photoelectron emission microscopy in nanostructures via standing-wave excited photoemission

    SciTech Connect

    Kronast, F.; Ovsyannikov, R.; Kaiser, A.; Wiemann, C.; Yang, S.-H.; Locatelli, A.; Burgler, D.E.; Schreiber, R.; Salmassi, F.; Fischer, P.; Durr, H.A.; Schneider, C.M.; Eberhardt, W.; Fadley, C.S.

    2008-11-24

    We present an extension of conventional laterally resolved soft x-ray photoelectron emission microscopy. A depth resolution along the surface normal down to a few {angstrom} can be achieved by setting up standing x-ray wave fields in a multilayer substrate. The sample is an Ag/Co/Au trilayer, whose first layer has a wedge profile, grown on a Si/MoSi2 multilayer mirror. Tuning the incident x-ray to the mirror Bragg angle we set up standing x-ray wave fields. We demonstrate the resulting depth resolution by imaging the standing wave fields as they move through the trilayer wedge structure.

  1. Effects of pressure and temperature on hot pressing a sialon

    NASA Technical Reports Server (NTRS)

    Yeh, H. C.

    1977-01-01

    Mixed powders (60 m/o Al2O3-40 m/o Si3N4) were hot pressed at temperatures and pressures from 1360 to 1750 C and 3.5 to 27.5 MPa (0.5 to 4.0 ksi). Fully dense sialon bodies are obtainable at temperatures and pressures as low as 1550 C and 0.5 ksi. The fully dense bodies contain Beta prime and x-phase. There is some evidence that plastic deformation has contributed to densification.

  2. Oxidation resistance and microstructure of Ru-capped extreme ultraviolet lithography multilayers

    SciTech Connect

    Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J B; Nguyen, N; Baker, S L; Robinson, J C; Taylor, J S; Aquila, A; Edwards, N V

    2005-06-15

    The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, were investigated to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure was analyzed in detail with transmission electron microscopy (TEM). As compared to other Ru capping layers preparations studied here it is the only one that shows grains with preferential orientation. This information is essential for modeling and performance optimization of EUVL multilayers.

  3. Oxidation resistance of Ru-capped EUV multilayers

    SciTech Connect

    Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J; Nguyen, N; Baker, S; Robinson, J C; Taylor, J S; Clift, M; Aquila, A; Gullikson, E M; Edwards, N G

    2005-02-23

    Differently prepared Ru-capping layers, deposited on Mo/Si EUV multilayers, have been characterized using a suite of metrologies to establish their baseline structural, optical, and surface properties in as-deposited state. Same capping layer structures were tested for their thermal stability and oxidation resistance. Post-mortem characterization identified changes due to accelerated tests. The best performing Ru-capping layer structure was studied in detail with transmission electron microscopy to identify the grain microstructure and texture. This information is essential for modeling and performance optimization of EUVL multilayers.

  4. Multilayer based soft-x-ray polarimeter at MAX IV Laboratory.

    PubMed

    Grizolli, Walan; Laksman, Joakim; Hennies, Franz; Jensen, Brian Norsk; Nyholm, Ralf; Sankari, Rami

    2016-02-01

    A high precision five rotation-axes polarimeter using transmission multilayers as polarizers and reflection multilayers as analyzers has been designed and manufactured. To cover the extreme ultraviolet regime, Mo/Si, Cr/C, Sc/Cr, and W/B4C multilayers for transmission and reflection have also been designed and produced. The polarimeter mechanics is supported on a hexapod to simplify the alignment relative to photon beam. The instrument is designed so that it can be easily transferred between different beamlines. PMID:26931886

  5. Multilayer based soft-x-ray polarimeter at MAX IV Laboratory

    NASA Astrophysics Data System (ADS)

    Grizolli, Walan; Laksman, Joakim; Hennies, Franz; Jensen, Brian Norsk; Nyholm, Ralf; Sankari, Rami

    2016-02-01

    A high precision five rotation-axes polarimeter using transmission multilayers as polarizers and reflection multilayers as analyzers has been designed and manufactured. To cover the extreme ultraviolet regime, Mo/Si, Cr/C, Sc/Cr, and W/B4C multilayers for transmission and reflection have also been designed and produced. The polarimeter mechanics is supported on a hexapod to simplify the alignment relative to photon beam. The instrument is designed so that it can be easily transferred between different beamlines.

  6. Circular multilayer zone plate for high-energy x-ray nano-imaging.

    PubMed

    Koyama, Takahisa; Takano, Hidekazu; Konishi, Shigeki; Tsuji, Takuya; Takenaka, Hisataka; Ichimaru, Satoshi; Ohchi, Tadayuki; Kagoshima, Yasushi

    2012-01-01

    A circular multilayer zone plate (MZP) was fabricated and its focusing performance was evaluated using 20-keV x-rays. MoSi(2) and Si layers were alternately deposited by DC magnetron sputtering on a wire core; all the interfaces satisfied the Fresnel zone condition. The measured line spread function was converted to a point spread function by tomographic reconstruction. The results suggest that the MZP has the potential to realize the diffraction-limited resolving power, which is calculated to be 35 nm using the diffraction integral. Furthermore, scanning transmission microscopy using the MZP could resolve a 50-nm line-and-space pattern. PMID:22299960

  7. Metal- and intermetallic-matrix composites for aerospace propulsion and power systems

    NASA Technical Reports Server (NTRS)

    Doychak, J.

    1992-01-01

    The requirements for high specific strength refractory materials of prospective military, civil, and space propulsion systems are presently addressed in the context of emerging capabilities in metal- and intermetallic-matrix composites. The candidate systems encompass composite matrix compositions of superalloy, Nb-Zr refractory alloy, Cu-base, and Ti-base alloy types, as well as such intermetallics as TiAl, Ti3Al, NiAl, and MoSi2. The brittleness of intermetallic matrices remains a major consideration, as does their general difficulty of fabrication.

  8. Scanning SQUID microscope study of vortex polygons and shells in weak-pinning disks of an amorphous superconducting film

    NASA Astrophysics Data System (ADS)

    Kokubo, Nobuhito; Okayasu, Satoru; Kanda, Akinobu; Shinozaki, Bunju

    2010-07-01

    Direct observation of vortices by the scanning superconducting quantum interference device microscopy was made on large mesoscopic disks of an amorphous MoGe thin film. Owing to the weak pinning nature of the amorphous film, vortices are able to form geometry induced, (quasi-)symmetric configurations of polygons, and concentric shells in the large disks. Systematic measurements made on selected disks allow us to trace not only how the vortex pattern evolves with magnetic field, but also how the vortex polygons change in size and rotate with respect to the disk center. The results are in good agreement with theoretical considerations for mesoscopic disks with sufficiently large diameter. A series of vortex images obtained in a disk with a pinning site reveals a unique line symmetry in vortex configurations, resulting in modifications of the shell filling rule and the magic number.

  9. Effect of Silicon on Activity Coefficients of Siderophile Elements (P, Au, Pd, As, Ge, Sb, and In) in Liquid Fe, with Application to Core Formation

    NASA Technical Reports Server (NTRS)

    Righter, K.; Pando, K.; Danielson, L. R.; Humayun, M.; Righter, M.; Lapen, T.; Boujibar, A.

    2016-01-01

    Earth's core contains approximately 10 percent light elements that are likely a combination of S, C, Si, and O, with Si possibly being the most abundant. Si dissolved into Fe liquids can have a large effect on the magnitude of the activity coefficient of siderophile elements (SE) in Fe liquids, and thus the partitioning behavior of those elements between core and mantle. The effect of Si can be small such as for Ni and Co, or large such as for Mo, Ge, Sb, As. The effect of Si on many siderophile elements is unknown yet could be an important, and as yet unquantified, influence on the core-mantle partitioning of SE. Here we report new experiments designed to quantify the effect of Si on the partitioning of P, Au, Pd, and many other SE between metal and silicate melt. The results will be applied to Earth, for which we have excellent constraints on the mantle siderophile element concentrations.

  10. Self passivating W-based alloys as plasma facing material for nuclear fusion

    NASA Astrophysics Data System (ADS)

    Koch, F.; Bolt, H.

    2007-03-01

    Self passivating tungsten-based alloys may provide a major safety advantage in comparison with pure tungsten (W) which is presently the main candidate material for the plasma-facing protection of future fusion power reactors. Films of binary and ternary tungsten alloys were synthesized by magnetron sputtering. The oxidation behaviour was measured with a thermo balance set-up under synthetic air at temperatures up to 1273 K. Binary alloys of W-Si showed good self passivation properties by forming an SiO2 film at the surface. Using ternary alloys the oxidation behaviour could be further improved. A compound of W-Si-Cr showed a reduction of the oxidation rate by a factor of 104 at 1273 K.

  11. Design and modeling of 40 keV X-ray optics for Titan experiment

    SciTech Connect

    Bajt, S

    2006-06-22

    In 2004 we designed and fabricated a 40 keV W/SiC multilayer coated mirrors with 2.0 nm period thickness that were tested at RAL (UK) in winter 2004/2005. The mirrors reflected from 35 to 70 keV (different grazing incidence angles) and showed high reflectivity. However, there was not enough beamtime at RAL to obtain quantitative results. Similar experiment will now be performed in Titan facility (LLNL). In this report we design and model multilayers with even shorter period than the ones used in 2004/2005 experiments. Our goal is to fabricate 1 nm period W/SiC multilayers with high reflectivity. This will enable operation at higher angle of grazing incidence and simplified the mounting fixture.

  12. Silicene-type Surface Reconstruction on C40 Hexagonal Silicides

    NASA Astrophysics Data System (ADS)

    Volders, Cameron; Reinke, Petra

    Silicene has emerged as the next two-dimensional material possessing a Dirac type electronic structure making it a prime candidate for integration in electronic devices. The study of silicene is relatively new and many aspects have yet to be fully understood. Here we present a scanning tunneling microscopy (STM) study of a Silicene-type surface reconstruction observed on nanometer scale hexagonal-MoSi2 crystallites. This surface reconstruction is specific to the C40 structure of h-MoSi2 and can initially be defined as a geometric silicene while the coupling between the silicene surface and the silicide bulk is under investigation. The lateral dimensions correspond to a superstructure where the silicene hexagons are slightly buckled and two of the six Si atoms are visible in the STM images creating a honeycomb pattern. The local electronic structure of the silicene is currently being studied with ST spectroscopy and the impact of confinement will be addressed. These results open an alternative route to Silicene growth by using surface reconstructions on metallic and semiconducting C40 silicide structures, which is promising for direct device integration on Si-platforms.

  13. Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography

    SciTech Connect

    Park, Y. R.; Ahn, J. H.; Kim, J. S.; Kwon, B. S.; Lee, N.-E.; Kang, H. Y.; Hwangbo, C. K.; Ahn, Jinho; Seo, Hwan Seok

    2010-07-15

    Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics with a completely different configuration than those of conventional photolithography. This study investigated the etching properties of indium tin oxide (ITO) binary mask materials for EUVL, such as ITO (absorber layer), Ru (capping/etch-stop layer), and a Mo-Si multilayer (reflective layer), by varying the Cl{sub 2}/Ar gas flow ratio, dc self-bias voltage (V{sub dc}), and etch time in inductively coupled plasmas. The ITO absorber layer needs to be etched with no loss in the Ru layer on the Mo-Si multilayer for fabrication of the EUVL ITO binary mask structure proposed here. The ITO layer could be etched with an infinitely high etch selectivity over the Ru etch-stop layer in Cl{sub 2}/Ar plasma even with a very high overetch time.

  14. Electrical properties of TiN on gallium nitride grown using different deposition conditions and annealing

    SciTech Connect

    Li, Liuan; Kishi, Akinori; Shiraishi, Takayuki; Jiang, Ying; Wang, Qingpeng; Ao, Jin-Ping

    2014-03-15

    This study evaluates the thermal stability of different refractory metal nitrides used as Schottky electrodes on GaN. The results demonstrate that TiN, MoSiN, and MoN possess good rectification and adhesion strength, with barrier heights of 0.56, 0.54, and 0.36 eV, respectively. After thermal treatment at 850 °C for 1 min, the TiN and MoN electrodes still exhibit rectifying characteristics, while the MoSiN degrades to an ohmic-like contact. For further study, several TiN films are deposited using different N{sub 2}/Ar reactive/inert sputtering gas ratios, thereby varying the nitrogen content present in the sputtering gas. Ohmic-like contact is observed with the pure Ti contact film, and Schottky characteristics are observed with the samples possessing nitrogen in the film. The average Schottky barrier height is about 0.5 eV and remains virtually constant with varying nitrogen deposition content. After examining Raman spectra and x-ray photoelectron spectroscopy results, the increase in the film resistivity after thermal treatment is attributed to oxidation and/or nitridation. Films deposited with a medium (40% and 60%) nitrogen content show the best film quality and thermal stability.

  15. Prediction of Reaction Kinetic in Mechanically Activated Self-Propagating High-Temperature Synthesis Process

    NASA Astrophysics Data System (ADS)

    Razavi, Mansour

    2012-12-01

    In this paper we have tried to develop a semi-empirical formula for estimation of starting time of reactions during mechanical alloying process according to self-propagating high temperature synthesis (SHS) mechanism. For this purpose, three SHS systems containing Ti-C, Mo-Si and Si-C were selected and their behaviors were observed. Aforementioned systems were milled in a planetary ball mill equipped with temperature sensor detector of cups. Samplings were done at different times of discontinuously milling. To change mills' energy, stainless steel and tungsten carbide balls were used. In order to detect the phases and characterizations of milled powder, XRD instrument was utilized. Results showed that all productions were synthesized after sudden increase in temperature. Maximum measured temperature and critical time had up and downtrends for production of TiC, MoSi2 and SiC, respectively. Crystalline size of milled powder had nano-meter scale. By using experimental data along with theoretical equations, a semi-empirical formula between critical time for transformation of raw materials to productions, type of milled system and ball mill parameter can be presented with high accuracy. According to calculated formula, critical time was related to ball mill energy and Gibbs free energy of milled system with direct and inverse proportionality, respectively.

  16. Processing, Microstructure, and Properties of Multiphase Mo Silicide Alloys

    SciTech Connect

    Heatherly, L.; Liu, C.T.; Schneibel, J.H.

    1998-11-30

    Multiphase Mo silicide alloys containing T2 (Mo{sub 5}SiB{sub 2}), Mo{sub 3}Si and Mo phases where prepared by both melting and casting (M and C) and powder metallurgical (PM) processes. Glassy phases are observed in PM materials but not in M and C materials. Microstructural studies indicate that the primary phase is Mo-rich solid solution in alloys containing {le}(9.4Si+13.8B, at. %) and T2 in alloys with {ge}(9.8Si+14.6B). An eutectic composition is estimated to be close to Mo-9.6Si-14.2B. The mechanical properties of multiphase silicide alloys were determined by hardness, tensile and bending tests at room temperature. The multiphase alloy MSB-18 (Mo-9.4Si-13.8B) possesses a flexure strength distinctly higher than that of MoSi{sub 2} and other Mo{sub 5}Si{sub 3} silicide alloys containing no Mo particles. Also, MSB-18 is tougher than MoSi{sub 2} by a factor of 4.

  17. Processing, microstructure, and properties of multiphase Mo silicide alloys

    SciTech Connect

    Liu, C.T.; Schneibel, J.H.; Heatherly, L.

    1999-07-01

    Multiphase Mo silicide alloys containing T2 (Mo{sub 5}SiB{sub 2}), Mo{sub 3}Si and Mo phases were prepared by both melting and casting (M and C) and powder metallurgical (PM) processes. Glassy phases are observed in PM materials but not in M and C materials. Microstructural studies indicate that the primary phase is Mo-rich solid solution in alloys containing {le}(9.4Si+13.8B, at.%) and T2 in alloys with {ge}(9.8Si+14.6B). An eutectic composition is estimated to be close to Mo-9.6Si-14.2B. The mechanical properties of multiphase silicide alloys were determined by hardness, tensile and bending tests at room temperature. The multiphase alloy MSB-18 (Mo-9.4Si-13.8B) possesses a flexure strength distinctly higher than that of MoSi{sub 2} and other Mo{sub 5}Si{sub 3} silicide alloys containing no Mo particles. Also, MSB-18 is tougher than MoSi{sub 2} by a factor of 4.

  18. Repair of high performance multilayer coatings

    SciTech Connect

    Gaines, D.P. . Dept. of Physics and Astronomy); Ceglio, N.M. ); Vernon, S.P. ); Krumrey, M.; Mueller, P. . VUV Radiometric Lab.)

    1991-07-01

    Fabrication and environmental damage issues may require that the multilayer x-ray reflection coatings used in soft x-ray projection lithography be replaced or repaired. Two repair strategies were investigated. The first was to overcoat defective multilayers with a new multilayer. The feasibility of this approach was demonstrated by depositing high reflectivity (61% at 130 {Angstrom}) molybdenum silicon (Mo/Si) multilayers onto fused silica figured optics that had already been coated with a Mo/Si multilayer. Because some types of damage mechanisms and fabrication errors are not repairable by this method, a second method of repair was investigated. The multilayer was stripped from the optical substrate by etching a release layer which was deposited onto the substrate beneath the multilayer. The release layer consisted of a 1000 {Angstrom} aluminum film deposited by ion beam sputtering or by electron beam evaporation, with a 300 {Angstrom} SiO{sub 2} protective overcoat. The substrates were superpolished zerodur optical flats. The normal incidence x-ray reflectivity of multilayers deposited on these aluminized substrates was degraded, presumably due to the roughness of the aluminum films. Multilayers, and the underlying release layers, have been removed without damaging the substrates.

  19. Repair of high-performance multilayer coatings

    NASA Astrophysics Data System (ADS)

    Gaines, David P.; Ceglio, Natale M.; Vernon, Stephen P.; Krumrey, Michael K.; Mueller, Peter

    1992-01-01

    Fabrication and environmental damage issues may require that the multilayer x-ray reflection coatings used in soft x-ray projection lithography be replaced or repaired. Two repair strategies were investigated. The first was to overcoat defective multilayers with a new multilayer. The feasibility of this approach was demonstrated by depositing high reflectivity (61% at 130 A) molybdenum silicon (Mo/Si) multilayers onto fused silica figured optics that had already been coated with a Mo/Si multilayer. Because some types of damage mechanisms and fabrication errors are not repairable by this method, a second method of repair was investigated. The multilayer was stripped from the optical substrate by etching a release layer which was deposited onto the substrate beneath the multilayer. The release layer consisted of a 1000 A aluminum film deposited by ion beam sputtering or by electron beam evaporation, with a 300 A SiO protective overcoat. The substrates were superpolished zerodur optical flats. The normal incidence x-ray reflectivity of multilayers deposited on these aluminized substrates was degraded, presumably due to roughness of the aluminum films. Multilayers, and the underlying release layers, have been removed without damaging the substrates.

  20. Microstructure of RERTR Du-alloys irradiated with krypton ions up to 100 dpa.

    SciTech Connect

    Gan, J.; Keiser, D.; Wachs, D.; Miller, B.; Allen, T.; Kirk, M.; Rest, J.

    2011-04-01

    The radiation stability of the interaction product formed at the fuel-matrix interface of research reactor dispersion fuels, under fission-product bombardment, has a strong impact on fuel performance. Three depleted uranium alloys were cast that consisted of the following five phases to be investigated: U(Si, Al){sub 3}, (U, Mo)(Si, Al){sub 3}, UMo{sub 2}Al{sub 20}, U{sub 6}Mo{sub 4}Al{sub 43}, and UAl{sub 4}. Irradiation of transmission electron microscopy (TEM) disc samples with 500-keV Kr ions at 200 C to doses up to {approx}100 displacements per atom (dpa) were conducted using a 300-keV electron microscope equipped with an ion accelerator. TEM results show that the U(Si, Al){sub 3} and UAl{sub 4} phases remain crystalline at 100 dpa without forming voids. The (U, Mo)(Si, Al){sub 3} and UMo{sub 2}Al{sub 20} phases become amorphous at 1 and {approx}2 dpa, respectively, and show no evidence of voids at 100 dpa. The U{sub 6}Mo{sub 4}Al{sub 43} phase goes to amorphous at less than 1 dpa and reveals high density voids at 100 dpa.

  1. Characterization and Hydrodesulfurization Properties of Catalysts Derived from Amorphous Metal-boron Materials

    SciTech Connect

    Parks, Greg; Pease, Melissa; Layman, Kathryn A.; Burns, Autumn W.; Bussell, Mark E.; Wang, Xianqin; Hanson, Jonathan; Rodriguez, Jose A.

    2007-01-22

    Unsupported and silica-supported amorphous metal-boron materials (Ni-B, Mo-O-B, and Ni-Mo-O-B) were prepared by NaBH4 reduction of aqueous or impregnated metal salts. The resulting materials were characterized by a range of techniques, including conventional and time-resolved X-ray diffraction. The latter technique was used to determine the onset of crystallization of the amorphous materials during annealing in He flow and to identify the phases formed. Annealing of unsupported Ni-B resulted in the crystallization of predominantly Ni3B, followed by Ni metal, whereas Ni-B/SiO2 formed Ni and then NiO. There was no evidence for crystallization of B-containing phases for Mo-O-B or Mo-O-B/SiO2 on annealing; instead, the predominant phase formed was MoO2. In general, the phases formed for Ni-Mo-O-B and Ni-Mo-O-B/SiO2 were consistent with those formed in the monometallic materials, but at higher annealing temperatures. Catalysts prepared by sulfiding Ni-B/SiO2 and Ni-Mo-O-B/SiO2 materials had significantly higher thiophene HDS activities than conventionally prepared sulfided Ni/SiO2 and Ni-Mo/SiO2 catalysts, whereas a sulfided Mo-O-B/SiO2 catalyst had a dramatically lower HDS activity than a sulfided Mo/SiO2 catalyst.

  2. Amorphous molybdenum silicon superconducting thin films

    SciTech Connect

    Bosworth, D. Sahonta, S.-L.; Barber, Z. H.; Hadfield, R. H.

    2015-08-15

    Amorphous superconductors have become attractive candidate materials for superconducting nanowire single-photon detectors due to their ease of growth, homogeneity and competitive superconducting properties. To date the majority of devices have been fabricated using W{sub x}Si{sub 1−x}, though other amorphous superconductors such as molybdenum silicide (Mo{sub x}Si{sub 1−x}) offer increased transition temperature. This study focuses on the properties of MoSi thin films grown by magnetron sputtering. We examine how the composition and growth conditions affect film properties. For 100 nm film thickness, we report that the superconducting transition temperature (Tc) reaches a maximum of 7.6 K at a composition of Mo{sub 83}Si{sub 17}. The transition temperature and amorphous character can be improved by cooling of the substrate during growth which inhibits formation of a crystalline phase. X-ray diffraction and transmission electron microscopy studies confirm the absence of long range order. We observe that for a range of 6 common substrates (silicon, thermally oxidized silicon, R- and C-plane sapphire, x-plane lithium niobate and quartz), there is no variation in superconducting transition temperature, making MoSi an excellent candidate material for SNSPDs.

  3. High-temperature crack-healing behaviour and strength recovery of (MoNb)Si2

    NASA Astrophysics Data System (ADS)

    Zhu, Gaoming; Wang, Xiaohong; Lu, Qiong; Wu, Guangzhi; Feng, Peizhong

    2015-07-01

    (MoNb)Si2 materials were prepared using combustion synthesis and the vacuum hot-pressing technology. Cracks were introduced on the surface of polished materials using the Vickers indentation method. The crack-healing behaviour of (MoNb)Si2 materials were investigated with high-temperature oxidation in air. The results show that after annealing at 900 °C, 1200 °C and 1500 °C for 1 h, the crack-healing behaviour was observed in each case. The bending strength obviously decreased when the cracks were introduced, and the materials significantly recovered after the heat treatment. The crack-healed samples exhibited higher bending strengths than the original level after the 1200 °C treatment, e.g. 479 MPa versus 195 MPa of pure MoSi2. MoSi2 micro alloyed with niobium shows a high bending strength at room temperature and excellent crack-healing properties at high temperatures.

  4. Investigation of new material combinations for hard x-ray telescope designs

    NASA Astrophysics Data System (ADS)

    Jensen, C. P.; Madsen, K. K.; Christensen, F. E.

    2006-06-01

    The materials chosen for depth graded multilayer designs for hard x-ray telescopes (10 keV to 80 keV) have until now been focusing on W/Si, W/SiC, Pt/C, and Pt/SiC. These material combinations have been chosen because of good stability over time and low interface roughness, However both W and Pt have absorption edges in the interesting energy range from 70 - 80 keV. If looking at the optical constants Cu and Ni would be good alternative high-Z candidates since the k-absorption edges in Cu and Ni is below 10 keV. We have investigated both of these materials as the reflecting layer in combination with SiC as the spacer layer and give the performance in terms of roughness, minimum obtainable d-spacing and stability over time as deposited in our planar magnetron sputtering facility. Likewise we review the same properties of WC/SiC coatings which we have previously developed and which allow for very small d-spacings. The combination of WC/SiC or the well established W/SiC with the above mentioned Cu and Ni-containing multilayers in the same stack allows for novel telescope designs operating up to and above 100 keV without the absorption edge structure.

  5. Alternate Multilayer Gratings with Enhanced Diffraction Efficiency in the 500-5000 eV Energy Domain

    NASA Astrophysics Data System (ADS)

    Polack, François; Lagarde, Bruno; Idir, Mourad; Cloup, Audrey Liard; Jourdain, Erick; Roulliay, Marc; Delmotte, Franck; Gautier, Julien; Ravet-Krill, Marie-Françoise

    2007-01-01

    An alternate multilayer (AML) grating is a 2 dimensional diffraction structure formed on an optical surface, having a 0.5 duty cycle in the in-plane and in the in-depth direction. It can be made by covering a shallow depth laminar grating with a multilayer stack. We show here that their 2D structure confer AML gratings a high angular and energetic selectivity and therefore enhanced diffraction properties, when used in grazing incidence. In the tender X-ray range (500eV - 5000 eV) they behave much like blazed gratings. Over 15% efficiency has been measured on a 1200 lines/mm Mo/Si AML grating in the 1.2 - 1.5 keV energy range. Computer simulations show that selected multilayer materials such as Cr/C should allow diffraction efficiency over 50% at photon energies over 3 keV.

  6. Microstructural and wear properties of sputtered carbides and silicides

    NASA Technical Reports Server (NTRS)

    Spalvins, T.

    1977-01-01

    Sputtered Cr3C2, Cr3Si2, and MoSi2 wear-resistant films (0.05 to 3.5 microns thick) were deposited on metal and glass surfaces. Electron transmission, electron diffraction, and scanning electron microscopy were used to determine the microstructural appearance. Strong adherence was obtained with these sputtered films. Internal stresses and defect crystallographic growth structures of various configurations within the film have progressively more undesirable effects for film thicknesses greater than 1.5 microns. Sliding contact and rolling element bearing tests were performed with these sputtered films. Bearings sputtered with a duplex coating (0.1-micron-thick undercoating of Cr3Si2 and subsequently 0.6-micron coating of MoS2) produced marked improvement over straight MoS2 films.

  7. Recent advances and developments in refractory alloys

    SciTech Connect

    Nieh, T.G.; Wadsworth, J.

    1993-11-01

    Refractory metal alloys based on Mo, W, Re, Ta, and Nb (Cb) find applications in a wide range of aerospace applications because of their high melting points and high-temperature strength. This paper, presents recent progress in understanding and applications of these alloys. Recent studies to improve the oxidation and mechanical behavior of refractory metal alloys, and particularly Nb alloys, are also discussed. Some Re structures, for extremely high temperature applications (> 2000C), made by CVD and P/M processes, are also illustrated. Interesting work on the development of new W alloys (W-HfC-X) and the characterization of some commercial refractory metals, e.g., K-doped W, TZM, and Nb-1%Zr, continues. Finally, recent developments in high temperature composites reinforced with refractory metal filaments, and refractory metal-based intermetallics, e.g., Nb{sub 3}Al, Nb{sub 2}Be{sub 17}, and MoSi{sub 2}, are briefly described.

  8. Comparison of the Thermal Expansion Behavior of Several Intermetallic Silicide Alloys Between 293 and 1523 K

    NASA Astrophysics Data System (ADS)

    Raj, S. V.

    2015-03-01

    Thermal expansion measurements were conducted on hot-pressed CrSi2, TiSi2, WSi2 and a two-phase Cr-Mo-Si intermetallic alloy between 303 and 1523 K during three heat-cool cycles. The corrected thermal expansion, (Δ L/ L 0)thermal, varied with the absolute temperature, T, as where, A, B, C, and D are regression constants. Excellent reproducibility was observed for most of the materials after the first heat-up cycle. In some cases, the data from first heat-up cycle deviated from those determined in the subsequent cycles. This deviation was attributed to the presence of residual stresses developed during processing, which are relieved after the first heat-up cycle.

  9. Solidification processing and phase transformations in ordered high temperature alloys. Final report, 30 March 1990-30 September 1992

    SciTech Connect

    Boettinger, W.J.; Bendersky, L.A.; Kattner, U.R.

    1993-01-20

    Useful high temperature alloys generally have microstructures consisting of more than one phase. Multiphase microstructures are necessary to develop acceptable toughness and creep strength in high temperature intermetallic alloy matrices. The optimum microstructures must be developed by a careful selection of processing path that includes both solidification and solid state heat treatment. Research has been conducted on the rapid solidification of selected intermetallic alloys and on the phase transformation paths that occur during cooling, primarily in the Ti-Al-Nb system. This report describes research performed in the Metallurgy Division at NIST under DARPA order 7469 between 1/1/89 and 12/31/92. Various research tasks were completed and the results have been published or have been submitted for publication.... Intermetallics, Ti-Al-Nb Alloys, Phase Diagrams, Phase Transformations, Ti-Al-Ta Alloys, MoSi2 Alloys.

  10. Nanoamorphous carbon-based photonic crystal infrared emitters

    DOEpatents

    Norwood, Robert A.; Skotheim, Terje

    2011-12-13

    Provided is a tunable radiation emitting structure comprising: a nanoamorphous carbon structure having a plurality of relief features provided in a periodic spatial configuration, wherein the relief features are separated from each other by adjacent recessed features, and wherein the nanoamorphous carbon comprises a total of from 0 to 60 atomic percent of one or more dopants of the dopant group consisting of: transition metals, lanthanoids, electro-conductive carbides, silicides and nitrides. In one embodiment, a dopant is selected from the group consisting of: Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Ag, Cd, La and other lanthanides, Hf, Ta, W, Rh, Os, Ir, Pt, Au, and Hg. In one embodiment, a dopant is selected from the group consisting of: electro-conductive carbides (like Mo.sub.2C), silicides (like MoSi.sub.2) and nitrides (like TiN).

  11. Property evaluation of thermal sprayed metallic coating by acoustic emission analysis

    SciTech Connect

    Ishida, Asako; Mizutani, Yoshihiro; Takemoto, Mikio; Ono, Kanji

    2000-03-01

    The authors analyzed acoustic emission signals from plasma sprayed sheets by first obtaining the Young's modulus, Poisson's ratio, and density. The sheets of a high Cr-Ni alloy (55Cr-41Ni-Mo, Si, B) were made by low pressure plasma spraying (LPPS) and heat treated. Utilizing laser induced surface acoustic waves (SAWs), the group velocity dispersion data of Rayleigh waves was obtained and matched to that computed by Adler's matrix transfer method. They monitored the acoustic emissions (Lamb waves) produced by microfractures in free standing as sprayed coating subjected to bending. Fast cleavage type microfracture with source rise time of around 2 {micro}s occurred as precursors to the final brittle fracture. The velocity and time-frequency amplitude spectrograms (wavelet contour maps) of the Lamb waves were utilized for the source location and fracture kinetic analyses.

  12. Molybdenum-tin as a solar cell metallization system

    NASA Astrophysics Data System (ADS)

    Boyd, D. W.; Radics, C.

    The operations of solar cell manufacture are briefly examined. The formation of reliable, ohmic, low-loss, and low-cost metal contacts on solar cells is a critical process step in cell manufacturing. In a commonly used process, low-cost metallization is achieved by screen printing a metal powder-glass frit ink on the surface of the Si surface and the conductive metal powder. A technique utilizing a molybdenum-tin alloy for the metal contacts appears to lower the cost of materials and to reduce process complexity. The ink used in this system is formulated from MoO3 with Sn powder and a trace amount of titanium resonate. Resistive losses of the resulting contacts are low because the ink contains no frit. The MoO3 is finally melted and reduced in forming gas (N2+H2) to Mo metal. The resulting Mo is highly reactive which facilitates the Mo-Si bonding.

  13. Molybdenum-tin as a solar cell metallization system

    NASA Technical Reports Server (NTRS)

    Boyd, D. W.; Radics, C.

    1981-01-01

    The operations of solar cell manufacture are briefly examined. The formation of reliable, ohmic, low-loss, and low-cost metal contacts on solar cells is a critical process step in cell manufacturing. In a commonly used process, low-cost metallization is achieved by screen printing a metal powder-glass frit ink on the surface of the Si surface and the conductive metal powder. A technique utilizing a molybdenum-tin alloy for the metal contacts appears to lower the cost of materials and to reduce process complexity. The ink used in this system is formulated from MoO3 with Sn powder and a trace amount of titanium resonate. Resistive losses of the resulting contacts are low because the ink contains no frit. The MoO3 is finally melted and reduced in forming gas (N2+H2) to Mo metal. The resulting Mo is highly reactive which facilitates the Mo-Si bonding.

  14. Oxidation and corrosion behavior of modified-composition, low-chromium 304 stainless steel alloys

    NASA Technical Reports Server (NTRS)

    Stephens, J. R.; Barrett, C. A.

    1977-01-01

    The effects of substituting less strategic elements than Cr on the oxidation and corrosion resistance of AISI 304 stainless steel were investigated. Cyclic oxidation resistance was evaluated at 870 C. Corrosion resistance was determined by exposure of specimens to a boiling copper-rich solution of copper sulfate and sulfuric acid. Alloy substitutes for Cr included Al, Mn, Mo, Si, Ti, V, Y, and misch metal. A level of about 12% Cr was the minimum amount of Cr required for adequate oxidation and corrosion resistance in the modified composition 304 stainless steels. This represents a Cr saving of at least 33%. Two alloys containing 12% Cr and 2% Al plus 2% Mo and 12% Cr plus 2.65% Si were identified as most promising for more detailed evaluation.

  15. Growth model of binary alloy nanopowders for thermal plasma synthesis

    SciTech Connect

    Shigeta, Masaya; Watanabe, Takayuki

    2010-08-15

    A new model is developed for numerical analysis of the entire growth process of binary alloy nanopowders in thermal plasma synthesis. The model can express any nanopowder profile in the particle size-composition distribution (PSCD). Moreover, its numerical solution algorithm is arithmetic and straightforward so that the model is easy to use. By virtue of these features, the model effectively simulates the collective and simultaneous combined process of binary homogeneous nucleation, binary heterogeneous cocondensation, and coagulation among nanoparticles. The effect of the freezing point depression due to nanoscale particle diameters is also considered in the model. In this study, the metal-silicon systems are particularly chosen as representative binary systems involving cocondensation processes. In consequence, the numerical calculation with the present model reveals the growth mechanisms of the Mo-Si and Ti-Si nanopowders by exhibiting their PSCD evolutions. The difference of the materials' saturation pressures strongly affects the growth behaviors and mature states of the binary alloy nanopowder.

  16. Diffusion Resistant, High-Purity Wafer Carriers For SI Semiconductor Production

    SciTech Connect

    Tiegs, T.N.; Leaskey, L.

    2000-10-01

    The Cooperative Research and Development Agreement (CRADA) was directed towards development of diffusion resistant, high-purity wafer carriers for Si semiconductor production with improved properties compared to current materials. The determination of the infiltration behavior is important for controlling the fabrication process to. obtain consistent high-quality products. Ammonium molybdate or molybdenum carbide were found to be suitable as a precursor to produce SiC-MoSi{sub 2}-Si composites by Si infiltration into carbon preforms. Experiments on the pyrolysis of the preforms showed variable infiltration behavior by the molten Si (within the range of conditions in the present study). Further research is required to reproducibly and consistently fabricate flaw-free articles. The strength of the composites fabricated to-date was 325{+-}124 MPa, which is higher than current commercial products. Better process control should result in higher average strengths and reduce the variability.

  17. Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror

    NASA Astrophysics Data System (ADS)

    Motai, Kumi; Oizumi, Hiroaki; Miyagaki, Shinji; Nishiyama, I.; Izumi, Akira; Ueno, Tomoya; Miyazaki, Yasuo; Namiki, Akira

    2007-03-01

    Atomic hydrogen cleaning has been developed to reduce the amount of surface oxide on Ru-capped Mo/Si multilayer mirrors for EUVL. Atomic hydrogen generated by a heated W wire catalyzer was supplied to a Ru cap layer that had been lightly oxidized by ECR O2 plasma or EUV irradiation. The effectiveness of atomic hydrogen in deoxidizing it was examined by ex situ AES, XPS, and EUV absolute reflectivity measurements; and it was found that the amount of surface oxide was reduced to the initial level and that the EUV reflectivity of a multilayer degraded by oxidation recovered. In addition, the transport of atomic hydrogen thorough a winding quartz tube was demonstrated to be a promising technique. The actual density of hydrogen radicals was directly measured under various conditions so that the conditions for generating atomic hydrogen could be optimized and the required treatment time shortened.

  18. Multilayer-based soft X-ray polarimeter at the Beijing Synchrotron Radiation Facility

    NASA Astrophysics Data System (ADS)

    Sun, Li-Juan; Cui, Ming-Qi; Zhu, Jie; Zhao, Yi-Dong; Zheng, Lei; Wang, Zhan-Shan; Zhu, Jing-Tao

    2013-07-01

    A compact high precision eight-axis automatism and two-axis manual soft-ray polarimeter with a multilayer has been designed, constructed, and installed in 3W1B at the Beijing Synchrotron Radiation Facility (BSRF). Four operational modes in the same device, which are double-reflection, double-transmission, front-reflection-behind-transmission and front-transmission-behind-reflection, have been realized. It can be used for the polarization analysis of synchrotron radiation. It also can be used to characterize the polarization properties of the optical elements in the soft X-ray energy range. Some experiments with Mo/Si and Cr/C multilayers have been performed by using this polarimeter with good results obtained.

  19. Processing of reaction-bonded silicon carbide without residual silicon phase

    SciTech Connect

    Messner, R.P.; Chiang, Y.M.

    1988-08-01

    Reaction-bonded silicon carbide free of the residual silicon phase that has previously limited upper use temperatures and mechanical properties has been synthesized by the infiltration of carbonaceous preforms using alloyed silicon melts. In this approach, rejection of the alloying components from the primary reacted silicon carbide phase into the remaining liquid forms a secondary refractory silicide, in a potentially broad and controllable range of volume fractions. Dense SiC-MoSi/sub 2/ materials free of residual silicon and residual carbon have been synthesized. In addition to a fully-infiltrated monolith, surface coatings on a carbon body have been synthesized by control of processing parameters. In each, the absence of free silicon and incorporation of the secondary phase is expected to improve mechanical properties. 14 references.

  20. Electronic effect of Na on Cu(In,Ga)Se2 solar cells

    NASA Astrophysics Data System (ADS)

    Cho, Dae-Hyung; Lee, Kyu-Seok; Chung, Yong-Duck; Kim, Ju-Hee; Park, Soo-Jeong; Kim, Jeha

    2012-07-01

    We report the effect of Na on the electronic properties of Cu(In,Ga)Se2 (CIGS) thin-film solar cells with a structure of grid/ITO/i-ZnO/CdS/CIGS/Mo/SiOx/soda-lime glass (SLG). The diffusion of Na from the SLG into the CIGS layer was systematically controlled by varying the thickness of SiOx. As the Na content increased, the hole concentration of CIGS was enhanced, while the band-gap was nearly constant, which led to a lower Fermi level in the CIGS towards its valence-band edge. The Na-induced increment in the built-in potential (Vbi) across the n-(ITO/i-ZnO/CdS)/p-CIGS junction yielded an increment of open-circuit voltage that well agreed with the calculated Vbi.

  1. Soft x-ray free electron laser microfocus for exploring matter under extreme conditions.

    PubMed

    Nelson, A J; Toleikis, S; Chapman, H; Bajt, S; Krzywinski, J; Chalupsky, J; Juha, L; Cihelka, J; Hajkova, V; Vysin, L; Burian, T; Kozlova, M; Fäustlin, R R; Nagler, B; Vinko, S M; Whitcher, T; Dzelzainis, T; Renner, O; Saksl, K; Khorsand, A R; Heimann, P A; Sobierajski, R; Klinger, D; Jurek, M; Pelka, J; Iwan, B; Andreasson, J; Timneanu, N; Fajardo, M; Wark, J S; Riley, D; Tschentscher, T; Hajdu, J; Lee, R W

    2009-09-28

    We have focused a beam (BL3) of FLASH (Free-electron LASer in Hamburg: lambda = 13.5 nm, pulse length 15 fs, pulse energy 10-40 microJ, 5 Hz) using a fine polished off-axis parabola having a focal length of 270 mm and coated with a Mo/Si multilayer with an initial reflectivity of 67% at 13.5 nm. The OAP was mounted and aligned with a picomotor controlled six-axis gimbal. Beam imprints on poly(methyl methacrylate) - PMMA were used to measure focus and the focused beam was used to create isochoric heating of various slab targets. Results show the focal spot has a diameter of < or =1 microm. Observations were correlated with simulations of best focus to provide further relevant information. PMID:19907618

  2. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography

    PubMed Central

    Tarrio, Charles; Grantham, Steven; Squires, Matthew B.; Vest, Robert E.; Lucatorto, Thomas B.

    2003-01-01

    Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.12 %. We report on two upgrades of our NIST/DARPA Reflectometry Facility that have given us the ability to achieve 0.1 % repeatability and 0.3 % absolute uncertainty in our reflectivity measurements. A third upgrade, a monochromator with thermal and mechanical stability for improved wavelength repeatability, is currently in the design phase.

  3. Printability of native blank defects and programmed defects and their stack structures

    NASA Astrophysics Data System (ADS)

    Kwon, Hyuk Joo; Harris-Jones, Jenah; Teki, Ranganath; Cordes, Aaron; Nakajima, Toshio; Mochi, Iacopo; Goldberg, Kenneth A.; Yamaguchi, Yuya; Kinoshita, Hiroo

    2011-11-01

    We describe the characterization of native phase defects in the manufacturing of extreme ultraviolet (EUV) mask blanks using the state-of-the-art mask metrology equipment in SEMATECH's Mask Blank Development Center (MBDC). We used commercially available quartz substrates and deposited Mo/Si multilayers on the substrates to characterize phase defects. We also prepared programmed defects of various dimensions using e-beam patterning technology on which multilayers were deposited. Transmission electron microscopy (TEM) was used to study multilayer profile changes, while SEMATECH's actinic inspection tool (AIT) was used to image defects and predict their printability. Defect images at different focal depths of the AIT are correlated to TEM cross sections and atomic force microscopy (AFM) dimensions. The printability of native and programmed defects was also investigated.

  4. Mechanical properties and oxidation and corrosion resistance of reduced-chromium 304 stainless steel alloys

    NASA Technical Reports Server (NTRS)

    Stephens, J. R.; Barrett, C. A.; Gyorgak, C. A.

    1979-01-01

    An experimental program was undertaken to identify effective substitutes for part of the Cr in 304 stainless steel as a method of conserving the strategic element Cr. Although special emphasis was placed on tensile properties, oxidation and corrosion resistance were also examined. Results indicate that over the temperature range of -196 C to 540 C the yield stress of experimental austenitic alloys with only 12 percent Cr compare favorably with the 18 percent Cr in 304 stainless steel. Oxidation resistance and in most cases corrosion resistance for the experimental alloys were comparable to the commercial alloy. Effective substitutes for Cr included Al, Mo, Si, Ti, and V, while Ni and Mn contents were increased to maintain an austenitic structure.

  5. Ultra-high efficiency multilayer blazed gratings through deposition kinetic control

    SciTech Connect

    Voronov, D. L.; Anderson, Erik H.; Gullikson, Eric M.; Salmassi, Farhad; Warwick, Tony; Yashchuk, Valeriy V.; Padmore, Howard A.

    2012-05-07

    Diffraction efficiency of multilayer coated blazed gratings (MBG) strongly depends on the perfection of the saw-tooth-shaped layers in the overall composite structure. Growth of multilayers on saw-tooth substrates should be carefully optimized in order to reduce groove profile distortion and at the same time to avoid significant roughening of multilayer interfaces. In this work we report on a new way to optimize growth of sputter-deposited Mo/Si multilayers on saw-tooth substrates through variation of the sputtering gas pressure. Lastly, a new record for diffraction efficiency of 44% was achieved for a optimized MBG with groove density of 5250 lines/mm at the wavelength of 13.1 nm.

  6. Materials corrosion and protection from first principles

    NASA Astrophysics Data System (ADS)

    Johnson, Donald F.

    suggests that alloying Fe with Si can be an effective means to limit uptake of these elements into steel. Spallation of protective layers on jet engine turbine blades is a problem that arises during thermal cycling. An alternative thermal barrier coating system involving MoSi2 is considered and calculations predict strong adhesion at the MoSi2/Ni interface. The interfacial bonding structure reveals a mixture of metallic and covalent cross-interface bonds. The adhesion energy is similar across all three MoSi2 facets studied. Upon exposure to oxygen, this MoSi2 alloy will form a strongly adhered oxide scale, which in turn may strongly adhere the heat shield material (yttria-stabilized zirconia), thereby potentially extending the lifetime of the barrier coating. Lastly, the interaction of hydrogen isotopes (fusion fuel) with tungsten (a proposed fusion reactor wall material) is examined. Exothermic dissociative adsorption is predicted, along with endothermic absorption and dissolution. Surface-to-subsurface diffusion energy barriers for H incorporation into bulk W are large and the corresponding outward diffusion barriers are very small. In bulk W, deep energetic traps (trapping multiple H atoms) are predicted at vacancy defects. Thus, under high neutron fluxes that will produce vacancies in W, H are predicted to collect at these vacancies. In turn, locally high concentrations of H at such vacancies will enhance decohesion of bulk W, consistent with observed blistering under deuterium implantation. Limiting vacancy formation may be key to the survival of W as a fusion reactor wall material.

  7. Process for producing dispersed particulate composite materials

    DOEpatents

    Henager, Jr., Charles H.; Hirth, John P.

    1995-01-01

    This invention is directed to a process for forming noninterwoven dispersed particulate composite products. In one case a composite multi-layer film product comprises a substantially noninterwoven multi-layer film having a plurality of discrete layers. This noninterwoven film comprises at least one discrete layer of a first material and at least one discrete layer of a second material. In another case the first and second materials are blended together with each other. In either case, the first material comprises a metalloid and the second material a metal compound. At least one component of a first material in one discrete layer undergoes a solid state displacement reaction with at least one component of a second material thereby producing the requisite noninterwoven composite film product. Preferably, the first material comprises silicon, the second material comprises Mo.sub.2 C, the third material comprises SiC and the fourth material comprises MoSi.sub.2.

  8. Microstructure Characterization of RERTR Fuel

    SciTech Connect

    J. Gan; B. D. Miller; D. D. Keiser; T. R. Allen; D. M. Wachs

    2008-09-01

    A variety of phases have the potential to develop in the irradiated fuels for the reduced enrichment research test reactor (RERTR) program. To study the radiation stability of these potential phases, three depleted uranium alloys were cast. The phases of interest were identified including U(Si,Al)3, (U,Mo)(Si,Al)3, UMo2Al20, UAl4, and U6Mo4Al43. These alloys were irradiated with 2.6 MeV protons at 200ºC up to 3.0 dpa. The microstructure is characterized using SEM and TEM. Microstructural characterization for an archive dispersion fuel plate (U-7Mo fuel particles in Al-2%Si cladding) was also carried out. TEM sample preparation for the irradiated dispersion fuel has been developed.

  9. 5000 groove/mm multilayer-coated blazed grating with 33percent efficiency in the 3rd order in the EUV wavelength range

    SciTech Connect

    Advanced Light Source; Voronov, Dmitriy L.; Anderson, Erik; Cambie, Rossana; Salmassi, Farhad; Gullikson, Eric; Yashchuk, Valeriy; Padmore, Howard; Ahn, Minseung; Chang, Chih-Hao; Heilmann, Ralf; Schattenburg, Mark

    2009-07-07

    We report on recent progress in developing diffraction gratings which can potentially provide extremely high spectral resolution of 105-106 in the EUV and soft x-ray photon energy ranges. Such a grating was fabricated by deposition of a multilayer on a substrate which consists ofa 6-degree blazed grating with a high groove density. The fabrication of the substrate gratings was based on scanning interference lithography and anisotropic wet etch of silicon single crystals. The optimized fabrication process provided precise control of the grating periodicity, and the grating groove profile, together with very short anti-blazed facets, and near atomically smooth surface blazed facets. The blazed grating coated with 20 Mo/Si bilayers demonstrated a diffraction efficiency in the third order as high as 33percent at an incidence angle of 11? and wavelength of 14.18 nm.

  10. Substitution for chromium in 304 stainless steel. [effects on oxidation and corrosion resistance

    NASA Technical Reports Server (NTRS)

    Stephens, J. R.; Barrett, C. A.

    1978-01-01

    An investigation was conducted to determine the effects of substituting less strategic elements for Cr on oxidation and corrosion resistance of AISI 304 stainless steel. Cyclic oxidation resistance was evaluated at 870 C. Corrosion resistance was determined by exposure of specimens to a boiling copper-rich solution of copper sulfate and sulfuric acid. Alloy substitutes for Cr included Al, Mn, Mo, Si, Ti, V, Y, and misch metal. A level of about 12% Cr was the minimum amount of Cr required for adequate oxidation and corrosion resistance in the modified composition 304 stainless steels. This represents a Cr saving of 33 percent. Two alloys containing 12% Cr plus 2% Al plus 2% Mo and 12% Cr plus 2.65% Si were identified which exhibited oxidation and corrosion resistance comparable to AISI 304 stainless steel.

  11. Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source

    NASA Astrophysics Data System (ADS)

    Barkusky, Frank; Bayer, Armin; Mann, Klaus

    2011-10-01

    We have investigated ablation of polymers with radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. A Schwarzschild objective with Mo/Si multilayer coatings was adapted to the source, generating an EUV spot of 5 μm diameter with a maximum energy density of ˜1.3 J/cm2. In combination with a Zirconium transmission filter, radiation of high spectral purity (2% bandwidth) can be provided on the irradiated spot. Ablation experiments were performed on PMMA, PTFE and PC. Ablation rates were determined for varying fluences using atomic force microscopy and white light interferometry. The slopes of these curves are discussed with respect to the chemical structure of the polymers. Additionally, the ablation behavior in terms of effective penetration depths, threshold fluences and incubation effects is compared to literature data for higher UV wavelength.

  12. High-temperature oxidation behavior of reaction-formed silicon carbide ceramics

    NASA Technical Reports Server (NTRS)

    Ogbuji, Linus U. J. T.; Singh, M.

    1995-01-01

    The oxidation behavior of reaction-formed silicon carbide (RFSC) ceramics was investigated in the temperature range of 1100 to 1400 C. The oxidation weight change was recorded by TGA; the oxidized materials were examined by light and electron microscopy, and the oxidation product by x-ray diffraction analysis (XRD). The materials exhibited initial weight loss, followed by passive weight gain (with enhanced parabolic rates, k(sub p)), and ending with a negative (logarithmic) deviation from the parabolic law. The weight loss arose from the oxidation of residual carbon, and the enhanced k(sub p) values from internal oxidation and the oxidation of residual silicon, while the logarithmic kinetics is thought to have resulted from crystallization of the oxide. The presence of a small amount of MoSi, in the RFSC material caused a further increase in the oxidation rate. The only solid oxidation product for all temperatures studied was silica.

  13. Characterization of a novel double-gas-jet laser plasma EUV source

    NASA Astrophysics Data System (ADS)

    de Bruijn, Rene; Bartnik, Andrzej; Fledderus, H. F.; Fiedorowicz, Henryk; Hegeman, Petra; Constantinescu, Raluca C.; Bijkerk, Fred

    2000-07-01

    A novel laser plasma EUV source geometry based on a (pulsed) double gas jet system has been characterized for utilization in EUV Lithography. The use of a secondary annular jet of a buffer gas in conjunction with the primary jet of target gas provides a considerable gain in EUV yield of an order of magnitude. The best CE data at 12.8 nm were obtained using xenon as target gas and hydrogen as buffer gas. The plasma source was driven using a short-wavelength KrF laser (0.9 J, 27 ns). Conversion efficiencies (CE) and EUV pulse shapes have been measured using calibrated Mo/Si multilayer mirrors and filtered junction diodes. A pinhole camera, equipped with a back illuminated CCD camera, was used to determine the plasma size in a wavelength range from 6 - 16 nm.

  14. Angle-resolved scattering and reflectance of extreme-ultraviolet multilayer coatings: measurement and analysis

    SciTech Connect

    Schroeder, Sven; Herffurth, Tobias; Trost, Marcus; Duparre, Angela

    2010-03-20

    Roughness-induced light scattering critically affects the performance of optical components, in particular at short wavelengths. We present a stand-alone instrument for angle-resolved scattering and reflectance measurements at 13.5 nm in the extreme-ultraviolet (EUV) spectral range. The achieved dynamic range allows even the scattering of high-quality EUV mirrors on extremely smooth substrates to be investigated. For Mo/Si multilayers, total scatter losses of several percent have been observed, depending on the substrate qualities as well as on roughening and smoothing effects during coating. Different approximate models for estimating the impact of roughness on scatter losses are discussed and compared with experimental results.

  15. Electron Beam Lithography Simulation for the Patterning of Extreme Ultraviolet Masks

    NASA Astrophysics Data System (ADS)

    Tsikrikas, N.; Patsis, G. P.; Raptis, I.; Gerardino, A.; Quesnel, E.

    2008-06-01

    Extreme ultraviolet lithography (EUVL) mask is a complex multilayer stack, fabricated with electron-beam lithography. Detailed understanding of the scattering events and energy loss mechanism of the electron beam within this stack is mandatory due to the high accuracy requirements of the fabrication process. Simulation of electron-beam lithography is performed incorporating the details of the mask material-stack and the metrological information of the final layout is quantified. The effect of the Mo-Si multilayer of the EUVL mask blank on the deposited energy in the resist film is investigated. Simulation of complex layout containing features of various sizes down to 100 nm reproduced experimental metrology trends on the fine features of the layout.

  16. Damage/organic free ozonated DI water cleaning on EUVL Ru capping layer

    NASA Astrophysics Data System (ADS)

    Lee, Seung-ho; Kang, Bong-kyun; Kim, Hyuk-min; Kim, Min-soo; Cho, Han-ku; Jeon, Chan-uk; Ko, Hyung-ho; Lee, Han-shin; Ahn, Jin-ho; Park, Jin-Goo

    2010-09-01

    The adaption of EUVL requires the development of new cleaning method for the removal of new contaminant without surface damage. One of the harsh contaminants is the carbon contamination generated during EUV exposure. This highly dense organic contaminant is hardly removed by conventional SPM solution on Ru capped Mo/Si multilayer. The hopeful candidate for this removal is ozonated water (DIO3), which is not only well-known strong oxidizer but also environmentally friendly solution. However, this solution might cause some damage to the Ru capping layer mostly depending on its concentration. For these reasons, DIO3 cleaning solutions, which are generated with various additive gases, were characterized to understand the correlation between DIO3 concentration and damages on 2.5 nm thick ruthenium (Ru) surface. An optimized DIO3 generation method and cleaning condition were developed with reduced surface damage. These phenomena were explained by electrochemical reaction.

  17. Surface Engineering of Mo-Base Alloys for Elevated-Temperature Environmental Resistance

    NASA Astrophysics Data System (ADS)

    Perepezko, J. H.

    2015-07-01

    The synthesis of robust coatings that provide protection against environmental attack at ultrahigh temperatures is a difficult challenge. To achieve this goal for Mo-base alloys, the fundamental concepts of reactive diffusion pathway analysis and kinetic biasing are used to design a multilayer Mo-Si-B-base coating with a phase sequencing that allows for structural and thermodynamic compatibility and an underlying diffusion barrier to maintain coating integrity. The coating design concepts have a general applicability. The coating structure evolution during high-temperature exposure facilitates a prolonged lifetime as well as self-healing capability. The borosilicide coatings that can be synthesized by a pack cementation process yield superior environmental resistance for Mo-base systems at temperatures up to at least 1,700°C and can be adapted to apply to other refractory metal and ceramic systems.

  18. Effects of post-weld heat treatment on microstructure and mechanical properties of laser welds in GH3535 superalloy

    NASA Astrophysics Data System (ADS)

    Yu, Kun; Jiang, Zhenguo; Leng, Bin; Li, Chaowen; Chen, Shuangjian; Tao, Wang; Zhou, Xingtai; Li, Zhijun

    2016-07-01

    In this study, the microstructure and mechanical properties of laser welds before and after post-weld heat treatment processes were studied. The results show that the tensile strength of the joints can be increased by 90 MPa by a post-weld heat treatment process at 871 °C for 6 h, exceeding the strength of the original state of the base metal. Besides, elongation of the joints are also increased to 43% by the process, whereas the elongation of as-welded joints are only 22%. In addition, the Charpy impact properties of laser welds almost do not change. Second phase precipitates, which were identified as Mo-Si rich M6C-type carbides by transmission electron diffraction and scanning electron microscope, were observed at solidification grain boundaries and solidification subgrain boundaries. These carbides can pin dislocations during the following tensile deformation, hence are responsible for the strengthening of tensile properties of the joints.

  19. A New Method of Metallization for Silicon Solar Cells

    NASA Technical Reports Server (NTRS)

    Macha, M.

    1979-01-01

    The determination of the firing cycle in a horizontal tube furnace for MoO3: Sn ink composition applied by silk screening process on P or N structured solar cells is presented. In comparison with the strip heater used to determine the reaction mechanism, the reduction of MoO3 in the tube furnace progresses at a much faster rate and the Sn:Mo alloy forms at a much lower temperature. The device characteristics determined by the V-I curve showed a high resistance (approx. 10 Ohms) at peak temperatures between 600 C and 800 C. The high series resistance is attributed to the lack of formation of MoSi2 within the used temperature range.

  20. EUV light source with high brightness at 13.5 nm

    SciTech Connect

    Borisov, V M; Prokof'ev, A V; Khristoforov, O B; Koshelev, K N; Khadzhiyskiy, F Yu

    2014-11-30

    The results of the studies on the development of a highbrightness radiation source in the extreme ultraviolet (EUV) range are presented. The source is intended for using in projection EUV lithography, EUV mask inspection, for the EUV metrology, etc. Novel approaches to creating a light source on the basis of Z-pinch in xenon allowed the maximal brightness [130 W(mm{sup 2} sr){sup -1}] to be achieved in the vicinity of plasma for this type of radiation sources within the 2% spectral band centred at the wavelength of 13.5 nm that corresponds to the maximal reflection of multilayer Mo/Si mirrors. In this spectral band the radiation power achieves 190 W in the solid angle of 2π at a pulse repetition rate of 1.9 kHz and an electric power of 20 kW, injected into the discharge. (laser applications and other topics in quantum electronics)

  1. Upgrading multilayer zone plate technology for hard x-ray focusing

    NASA Astrophysics Data System (ADS)

    Hirotomo, Toshiki; Takano, Hidekazu; Sumida, Kazuhiro; Koyama, Takahisa; Konishi, Shigeki; Ichimaru, Satoshi; Ohchi, Tadayuki; Takenaka, Hisataka; Tsusaka, Yoshiyuki; Kagoshima, Yasushi

    2016-01-01

    Multilayer zone plate (MZP) technology for hard X-ray focusing was upgraded and its focusing performance was evaluated using 20-keV X-rays at the synchrotron beamline (BL24XU) of SPring-8. The MZP consists of MoSi2 and Si layers alternately deposited on a glass fiber by magnetron sputtering so that all zone boundaries satisfy the Fresnel zone configuration. The focused beam was evaluated using knife-edge scanning in which the measured intensity distribution is identical to the line spread function (LSF) in the focal plane. The focused beamsize of about 30 nm was estimated by oscillation peaks observed in the measured LSF according to Rayleigh's criterion.

  2. Friction and wear properties of three hard refractory coatings applied by radiofrequency sputtering

    NASA Technical Reports Server (NTRS)

    Brainard, W. A.

    1977-01-01

    The adherence, friction, and wear properties of thin hard refractory compound coatings applied to 440C bearing steel by radiofrequency sputtering were investigated. Friction and wear tests were done with nonconforming pin on disk specimens. The compounds examined were chromium carbide, molybdenum silicide, and titanium carbide. The adherence, friction, and wear were markedly improved by the application of a bias voltage to the bearing steel substrate during coating deposition. Analysis by X-ray photoelectron spectroscopy indicated that the improvement may be due to a reduction in impurities in bias deposited coatings. A fivefold reduction in oxygen concentration in MoSi2 coating by biasing was noted. Chromium carbide was not effective as an antiwear coating. Molybdenum silicide provided some reduction in both friction and wear. Titanium carbide exhibited excellent friction and antiwear properties at light loads. Plastic flow and transfer of the coating material onto the pin specimen appears to be important in achieving low friction and wear.

  3. [Investigation of the role of Zn2+ and zinc-containing proteins in the pathogenesis of bone inflammmation (the case of periodontitis)].

    PubMed

    Petrovich, Iu A; Ramazanov, T D; Kichenko, S M; Lebedev, V K

    2011-01-01

    The levels of Ag, Al, Bi, Co, Cr, Fe, Mo, Si in osseous tissue of periodontium of domestic cats decreased in case of periodontitis in comparision with those of a healthy animals. At the same time the level of Zn increased dramatically. The level of tagged [14C] glycine in protein of bones of periodontium increased twofold and [35S] methionine 1,54 times which is explained by the fact of predominance of I type collagen in which one third of amino acids is represented by glycine while sulfur-containing amino acids are virtually absent. The latter are contained in non-collagenous proteins of bones of periodontium contributing for its metabolism. The difference in tagged aminoacids inclusion in bones of periodontium is mainly provoked by redistribution of the collagen and non-collagenous proteins. PMID:22359934

  4. Multilayer coatings of 10x projection for extreme-ultraviolet lithography

    SciTech Connect

    Folta, J A; Montcalm, C; Spiller, E; Wedowski, M

    1999-03-09

    Two new sets of projections optics for the prototype 10X reduction EUV lithography system were coated with Mo/Si multilayers. The coating thickness was graded across the optics by using shadow masks to ensure maximum throughput at all incidence angles in the camera. The overall deviation of the (normalized) wavelength response across the clear aperture of each mirror is below 0.01% RMS. However, the wavelength mismatch between two optics coated in different runs is up to 0.07 nm. Nevertheless, this is still within the allowed tolerances, and the predicted optical throughput loss in the camera due to such wavelength mismatch is about 4%. EUV reflectances of 63-65% were measured around 13.40 nm for the secondary optics, which is in good agreement with the expected reflectance based on the substrate finish as measured with AFM.

  5. Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography

    SciTech Connect

    Soufli, R; Hudyma, R M; Spiller, E; Gullikson, E M; Schmidt, M A; Robinson, J C; Baker, S L; Walton, C C; Taylor, J S

    2007-01-03

    This manuscript discusses the multilayer coating results for the primary and secondary mirrors of the Micro Exposure Tool (MET): a 0.30-numerical aperture (NA) lithographic imaging system with 200 x 600 {micro}m{sup 2} field of view at the wafer plane, operating in the extreme ultraviolet (EUV) wavelength region. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates, and a velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms to achieve sub-diffraction-limited performance. This work represents the first experimental demonstration of sub-diffraction-limited multilayer coatings for high-NA EUV imaging systems.

  6. High-durability phase-shift film with variable transmittance

    NASA Astrophysics Data System (ADS)

    Nozawa, Osamu; Shishido, Hiroaki; Kajiwara, Takenori

    2015-10-01

    In order to maintain the lithographic margin and to have sufficient image resolution, attenuated phase shift masks are widely used as a resolution enhancement technique. To improve the radiation durability of the phase shift film, we have developed low oxidation MoSi shifters, such as A6L2, as one option for improving radiation durability. But to provide the best radiation durability, we have developed a new approach eliminating the molybdenum from the phase shift film and introduced a Silicon-Nitride (Si-N) based attenuated phase shift film. Traditionally the transmittance of the phase shift layer is usually around 6%. In the case of a pure Si3N4 film, the transmittance with 180 degree phase shift is around 18%. But, by controlling film structure with a combination of Si-N the transmittance can be tuned to the customers desired transmission value for high durability Mo free attenuated phase shift films.

  7. Experimental investigations on the chemical state of solid fission-product elements in U3Si2

    NASA Astrophysics Data System (ADS)

    Ugajin, M.; Itoh, A.

    1994-10-01

    The uranium silicide U3Si2 has a congruent melting point of 1665 C and possesses higher uranium density (11.3 g U/cc) and higher thermal conductivity than the uranium dioxide currently used in light water reactors. U3Si2 is in use as a research reactor fuel (US Nuclear Regulatory Commission, NUREG-1313, July, 1988), representing a potentiality for power reactor fuel. A first attempt is made in this study to predict the chemical state of the solid fission-product elements comprising zirconium, molybdenum, rare earth elements, alkaline earth metals and elements of the platinum group. Ternary phase equilibria in the U-Mo-Si and U-Ru-Si systems are also investigated to supplement the fission product chemistry in U3Si2.

  8. In-line phase retarder and polarimeter for conversion of linear to circular polarization

    SciTech Connect

    Kortright, J.B.; Smith, N.V.; Denlinger, J.D.

    1997-04-01

    An in-line polarimeter including phase retarder and linear polarizer was designed and commissioned on undulator beamline 7.0 for the purpose of converting linear to circular polarization for experiments downstream. In commissioning studies, Mo/Si multilayers at 95 eV were used both as the upstream, freestanding phase retarder and the downstream linear polarized. The polarization properties of the phase retarder were characterized by direct polarimetry and by collecting MCD spectra in photoemission from Gd and other magnetic surfaces. The resonant birefringence of transmission multilayers results from differing distributions of s- and p-component wave fields in the multilayer when operating near a structural (Bragg) interference condition. The resulting phase retardation is especially strong when the interference is at or near the Brewster angle, which is roughly 45{degrees} in the EUV and soft x-ray ranges.

  9. Imaging 100 nm contacts with high transmission attenuated phase shift masks

    NASA Astrophysics Data System (ADS)

    Beach, James V.; Petersen, John S.; Eynon, Benjamin G., Jr.; Taylor, Darren; Gerold, Dave J.; Maslow, Mark J.

    2002-12-01

    This study explores the capability of printing 100 nm contacts through the use of 9% and 15% attenuated phase shift masks and a 0.75 NA 193 nm scanner. The mask designs targeted simultaneous solutions for 100 nm contacts at pitches from 200 nm to 300 nm. The two masks were successfully manufactured from experimental MoSiON embedded-attenuated phase shift mask (EAPSM) blanks. The 100 nm contacts were successfully printed with a depth of focus (DOF) from 0.1-0.7 μm. Overlapping process windows were not achieved but were possible upon adjustment of the mask biases. The observed mask error enhancement factor (MEEF) was approximately 3 for the 220 nm pitch. Side lobe printing was not observed for either mask.

  10. Precipitation of Laves phase in a 28%Cr-4%Ni-2%Mo-Nb superferritic stainless steel

    SciTech Connect

    Fontoura de Andrade, Thiago; Madeira Kliauga, Andrea; Plaut, Ronald Lesley; Padilha, Angelo Fernando

    2008-05-15

    The main objective of the present work was to study the precipitation of the Laves phase in the X1 CrNiMoNb 28 4 2 (Werkstoff-Nr. DIN 1.4575) superferritic stainless steel employing several complementary techniques of microstructural analysis. The phase that precipitated in largest quantity in the DIN 1.4575 steel was the sigma ({sigma}) phase. However, along grain boundaries, after aging at 850 deg. C, a Laves phase of the MgZn{sub 2} type, with a hexagonal C14 crystal structure and chemical composition (Fe,Cr,Ni){sub 2}(Nb,Mo,Si), was also identified. Growth of the Laves phase is curtailed by exhaustion of niobium of the matrix and by the presence of the sigma phase, which also precipitates in the vicinity of the grain boundaries, however in larger amounts. No chi ({chi}) or austenite phases were detected in the temperature range studied.

  11. The work function engineering and thermal stability of novel metal gate electrodes for advanced CMOS devices

    NASA Astrophysics Data System (ADS)

    Zhao, Penghui

    The continuous scaling of Complementary Metal Oxide Semiconductor (CMOS) integrated circuits requires the replacement of the conventional poly-silicon gate electrode and silicon dioxide gate dielectric with metal gate electrodes and high-agate dielectrics, respectively. The most critical requirements for alternative metal gates are proper work function and good thermal stability. This dissertation has focused on the effective work function and thermal stability of molybdenum-based metal gates (Mo, MoN, and MoSiN) and fully silicided (FUSI) NiSi metal gates. Capacitance-Voltage (C-V) and Current-Voltage (I-V) measurements of MOS capacitors were performed to investigate the electrical properties of molybdenum-based metal gates. Four-point probe resistivity measurements, Rutherford Backscattering Spectroscopy (RBS), X-ray Photoelectron Spectroscopy (XPS), High Resolution Transmission Electron Microscopy (HR-TEM), Electron Nanodiffraction analysis, X-ray Diffraction (XRD) and backside Secondary Ion Mass Spectroscopy (SIMS) methods were performed as well, to characterize the thermal stability of metal gate electrodes. The effective work function and thermal stability of molybdenum-based metal gates (Mo, MoN and MoSiN) on both SiO2 and Hf-based high-kappadielectrics have been evaluated systematically. The effects of silicon and nitrogen concentrations on the work function and thermal stability are discussed. The effective work function of molybdenum nitrides on both SiO2 and Hf-based high-kappadielectrics can be tuned to ˜4.4-4.5 eV, however, the thermal budgets should be less than 900°C 10 sec due to nitrogen loss and the phase transformation behavior of molybdenum nitrides. Silicon incorporation in the Mo-N system can improve the film thermal stability and diffusion barrier properties at the interface of metal gates/dielectrics due to the presence of Si-N bonds. By optimizing the film composition, the work function of MoSiN gates on SiO2 can be tuned for fully

  12. Software for x-ray optics research instrumentation. Final report, 1991

    SciTech Connect

    Knight, L.V.

    1992-03-01

    The statement of work for this contract between The Regents of the University of California and Brigham Young University called for the implementation of computer controlled substrate motion in an existing DC magnetron sputtering system. This task entailed the design and fabrication of a vacuum compatible motor drive and substrate holder, the system had to be capable of closed loop microcomputer control which required the development of a suitable computer interface and control software. Concurrent with this task, the existing magnetron sputtering system was to be upgraded to permit ion assisted deposition. This required modification of the existing sputtering hardware to permit independent control of voltages applied to the substrate and other additional electrode assemblies. In addition to design, fabrication and installation of the system modifications a systematic study of Mo-Si multilayer coatings grown using ion assisted deposition was undertaken. These studies served, in part, as training of LLNL personnel in the ion assisted deposition technique.

  13. Systematic studies on transition layers of carbides between CVD diamond films and substrates of strong carbide-forming elements

    NASA Astrophysics Data System (ADS)

    Jiang, Xiang-Liu; Zhang, Fang-Qing; Li, Jiang-Qi; Yang, Bin; Chen, Guang-Hua

    1991-12-01

    The nucleation and growth mechanism of polycrystalline diamond films prepared by chemical vapor deposition (CVD) have received increasing research interest. To verify the existence of the transition layers between CVD diamond films and substrates, and to investigate their composition, structure and properties are very meaningful research topics for understanding the mechanism of diamond film growth and developing the applications of CVD diamond films. In this work, the transition layers of carbides for the substrates of molybdenum (Mo), silicon (Si), tungsten (W), tantalum (Ta), and niobium (Nb) and titanium (Ti) have been systematically studied by x-ray diffraction characterization. The experiment results have provided evidence of the existence of transition layers and have revealed that the transition layers are polycrystalline Mo2C, SiC, WC and W2C, TaC and Ta2C, NbC and Nb2C, as well as TiC for the substrates of Mo, Si, W, Ta, Nb and Ti, respectively.

  14. Efficiency of a multilayer-coated, ion-etched laminar holographic grating in the 14.5{endash}16.0-nm wavelength region

    SciTech Connect

    Kowalski, M.P.; Cruddace, R.G.; Seely, J.F.; Rife, J.C.; Heidemann, K.F.; Heinzmann, U.; Kleineberg, U.; Osterried, K.; Menke, D.; Hunter, W.R.

    1997-06-01

    The efficiency of an ion-etched laminar holographic grating was measured at near-normal incidence in the 14.5{endash}16.0-nm wavelength range. The grating had an electron-beam-evaporated Mo/Si multilayer coating matched to the grating groove depth. The efficiency peaked at 16.3{percent} in the first inside order at 15.12nm and 15.0{percent} in the first outside order at 14.94nm. These are believed to be the highest efficiencies obtained to date from a multilayer-coated laminar grating at near-normal incidence in the EUV ({lambda}{lt}30.0 nm). Zero and even orders were almost completely suppressed. The grating groove efficiency in the first order approached the theoretical limit of 40.5{percent}. {copyright} {ital 1997} {ital Optical Society of America}

  15. Matrix-assisted laser desorption/ionization time-of-flight mass spectrometry using an inorganic particle matrix for small molecule analysis

    PubMed

    Kinumi; Saisu; Takayama; Niwa

    2000-03-01

    Fine metal or metal oxide powder as an alternative to conventional organic matrices in matrix-assisted laser desorption/ionization time-of-flight mass spectrometry (MALDI-TOFMS) has been utilized successfully for lower molecular mass analytes, poly(ethylene glycol) 200 (PEG 200) and methyl stearate. Eleven kinds of particle, Al, Mn, Mo, Si, Sn, SnO2, TiO2, W, WO3, Zn and ZnO, were evaluated. The analyte was mixed with a metal or metal oxide powder (inorganic matrix) with particle diameter of tens of micrometers and liquid dispersant, followed by application to the sample target. Using a commercial MALDI-TOFMS instrument equipped with an internal 337 nm pulsed nitrogen laser, the analytes, PEG 200 and methyl stearate, were ionized as the alkali metal ion adducted molecules [M+Na]+ or [M+K]+ when the inorganic matrices Mn, Mo, Si, Sn, TiO2, W, WO3, Zn or ZnO were used. In the case of an Al matrix, PEG 200 was ionized as [M+K]+, whereas methyl stearate was ionized as [M+H]+ and [M+Al]+. These particles have potential as the matrix for MALDI. During our examination, however, only SnO2 particles did not ionize either PEG 200 or methyl stearate. Based on our protocol, when TiO2 powder was suspended with liquid paraffin, PEG 200 and methyl stearate gave their MALDI-TOF mass spectra with the lowest background noise and highest intensity. TiO2 powder seemed to be a broad potential matrix for low molecular mass polar or non-polar analytes. The results suggested that bulk particles caused rapid heating/vaporization processes and ionized analyte molecules under irradiation with a pulsed UV laser. The present method can be readily applied to obtain the low background noise MALDI-TOF mass spectra of small-sized compounds. PMID:10767772

  16. Advanced repair solution of clear defects on HTPSM by using nanomachining tool

    NASA Astrophysics Data System (ADS)

    Lee, Hyemi; Kim, Munsik; Jung, Hoyong; Kim, Sangpyo; Yim, Donggyu

    2015-10-01

    As the mask specifications become tighter for low k1 lithography, more aggressive repair accuracy is required below sub 20nm tech. node. To meet tight defect specifications, many maskshops select effective repair tools according to defect types. Normally, pattern defects are repaired by the e-beam repair tool and soft defects such as particles are repaired by the nanomachining tool. It is difficult for an e-beam repair tool to remove particle defects because it uses chemical reaction between gas and electron, and a nanomachining tool, which uses physical reaction between a nano-tip and defects, cannot be applied for repairing clear defects. Generally, film deposition process is widely used for repairing clear defects. However, the deposited film has weak cleaning durability, so it is easily removed by accumulated cleaning process. Although the deposited film is strongly attached on MoSiN(or Qz) film, the adhesive strength between deposited Cr film and MoSiN(or Qz) film becomes weaker and weaker by the accumulated energy when masks are exposed in a scanner tool due to the different coefficient of thermal expansion of each materials. Therefore, whenever a re-pellicle process is needed to a mask, all deposited repair points have to be confirmed whether those deposition film are damaged or not. And if a deposition point is damaged, repair process is needed again. This process causes longer and more complex process. In this paper, the basic theory and the principle are introduced to recover clear defects by using nanomachining tool, and the evaluated results are reviewed at dense line (L/S) patterns and contact hole (C/H) patterns. Also, the results using a nanomachining were compared with those using an e-beam repair tool, including the cleaning durability evaluated by the accumulated cleaning process. Besides, we discuss the phase shift issue and the solution about the image placement error caused by phase error.

  17. M5Si3(M=Ti, Nb, Mo) Based Transition-Metal Silicides for High Temperature Applications

    SciTech Connect

    Tang, Zhihong

    2007-01-01

    Transition metal silicides are being considered for future engine turbine components at temperatures up to 1600 C. Although significant improvement in high temperature strength, room temperature fracture toughness has been realized in the past decade, further improvement in oxidation resistance is needed. Oxidation mechanism of Ti5Si3-based alloys was investigated. Oxidation behavior of Ti5Si3-based alloy strongly depends on the atmosphere. Presence of Nitrogen alters the oxidation behavior of Ti5Si3 by nucleation and growth of nitride subscale. Ti5Si3.2and Ti5Si3C0.5 alloys exhibited an excellent oxidation resistance in nitrogen bearing atmosphere due to limited dissolution of nitrogen and increased Si/Ti activity ratio. MoSi2 coating developed by pack cementation to protect Mo-based Mo-Si-B composites was found to be effective up to 1500 C. Shifting coating composition to T1+T2+Mo3Si region showed the possibility to extend the coating lifetime above 1500 C by more than ten times via formation of slow growing Mo3Si or T2 interlayer without sacrificing the oxidation resistance of the coating. The phase equilibria in the Nb-rich portion of Nb-B system has been evaluated experimentally using metallographic analysis and differential thermal analyzer (DTA). It was shown that Nbss (solid solution) and NbB are the only two primary phases in the 0-40 at.% B composition range, and the eutectic reaction L {leftrightarrow} NbSS + NbB was determined to occur at 2104 ± 5 C by DTA.

  18. Development of intermetallic-hardened abrasion-resistant weld hardfacing alloys

    SciTech Connect

    School, M.R.

    1986-01-01

    Chromium and cobalt are strategic materials in the US and both are major constituents in many weld hardfacing alloys. Substitution for these materials or alternatives to their use was a primary direction of this investigation which was conducted in conjunction with the US Bureau of Mines. Minimization of the use of strategic materials was the criteria guiding the development of intermetallic-hardened abrasion resistant weld hardfacing materials. Other criteria were that the new alloy contain a hard intermetallic compound in an FCC matrix, and that these intermetallic compounds be stable at room temperature. A survey of ternary systems was made and the Fe-Mo-Ni system was selected to provide a basis for alloy development. Fe-Mo-Ni alloys synthesized by arc-melting and similar alloys made by welding possessed similar microstructures, a (Fe, Ni){sub 7}Mo{sub 6} intermetallic plus austenite eutectic in an austenitic matrix. These materials exhibited poor abrasive resistance. Silicon additions to the alloy promoted formation of a Laves phase FeMoSi intermetallic which helped increase the abrasive wear resistance. Through a series of alloy chemistry iterations a final composition of Fe-20Mo-15Ni-5Si was selected. Heat treatment of this alloy at 550 to 650 C caused second phase precipitation in the matrix and raised the hardness about 14 points HRC to 50 HRC. The alloy's wear rate, measured with the pin-on-drum abrasive wear test, was 6.3 to 6.5 mg/m. However this was twice the wear rate observed in commercial high-carbon high-chromium alloys. Based on examination of the alloy microstructures, their chemistry, and an analysis of the Fe-Mo-Si phase system; directions for further research are to increase the molybdenum and silicon content to produce a Fe-20Mo-10Ni-15Si composition.

  19. Mask CD uniformity metrology for logic patterning and its correlation to wafer data

    NASA Astrophysics Data System (ADS)

    Le Gratiet, Bertrand; Zékri, Raphaël.; Sundermann, Frank; Trautzsch, Thomas; Thaler, Thomas; Birkner, Robert; Buttgereit, Ute

    2012-06-01

    With the next technology nodes 193nm lithography is pushed to its utmost limits. The industry is forced to print at low k1 factor which goes along with a high MEEF. Additionally, new blank materials are being introduced for smaller nodes. From 4x node and beyond, global CD uniformity on wafer is getting more critical and becomes key factor to ensure a high yield in chip production. Advanced process control is required and correction strategies are applied to maintain tight wafer CD uniformity. Beside other parameters, like scanner and etch process, mask CD uniformity is one main contributor to the intra-field CD on wafer. To enable effective CDU correction strategies it is necessary to establish a mask CD uniformity metrology which shows a good correlation to wafer prints. Especially for logic pattern mask uniformity measurements to control intra-field CD uniformity becomes challenging. In this paper we will focus on mask CD uniformity measurement for logic application utilizing WLCD, which is based on aerial image technology. We will investigate 40nm node and 28nm node gate masks using 6% MoSi phase shifting mask and MoSi binary mask respectively. Furthermore, we will correlate the mask CD uniformity data to wafer data to evaluate the capability of WLCD to predict the intra-field wafer CD uniformity correctly in order to support feedforward correction strategies. We will show that WLCD shows an excellent correlation to wafer data. Additionally, we will provide an outlook on logic contact-hole masks showing first CD uniformity data and wafer correlation data.

  20. Effectiveness of Diffusion Barrier Coatings for Mo-Re Embedded in C/SiC and C/C

    NASA Technical Reports Server (NTRS)

    Glass, David E.; Shenoy, Ravi N.; Wang, Zeng-Mei; Halbig, Michael C.

    2001-01-01

    Advanced high-temperature cooling applications may often require the elevated-temperature capability of carbon/silicon carbide or carbon/carbon composites in combination with the hermetic capability of metallic tubes. In this paper, the effects of C/SiC and C/C on tubes fabricated from several different refractory metals were evaluated. Though Mo, Nb, and Re were evaluated in the present study, the primary effort was directed toward two alloys of Mo-Re, namely, arc cast Mo-41Re and powder metallurgy Mo-47.5Re. Samples of these refractory metals were subjected to either the PyC/SiC deposition or embedding in C/C. MoSi2(Ge), R512E, and TiB2 coatings were included on several of the samples as potential diffusion barriers. The effects of the processing and thermal exposure on the samples were evaluated by conducting burst tests, microhardness surveys, and scanning electron microscopic examination (using either secondary electron or back scattered electron imaging and energy dispersive spectroscopy). The results showed that a layer of brittle Mo-carbide formed on the substrates of both the uncoated Mo-41Re and the uncoated Mo-47.5Re, subsequent to the C/C or the PyC/SiC processing. Both the R512E and the MoSi2(Ge) coatings were effective in preventing not only the diffusion of C into the Mo-Re substrate, but also the formation of the Mo-carbides. However, none of the coatings were effective at preventing both C and Si diffusion without some degradation of the substrate.

  1. M(5)-silicon (M= titanium, niobium, molybdenum) based transition-metal silicides for high temperature applications

    NASA Astrophysics Data System (ADS)

    Tang, Zhihong

    2007-12-01

    Transition metal silicides are being considered for future engine turbine components at temperatures up to 1600ºC. Although significant improvement in high temperature strength, room temperature fracture toughness has been realized in the past decade, further improvement in oxidation resistance is needed. Oxidation mechanism of Ti5Si3-based alloys was investigated. Oxidation behavior of Ti5Si3-based alloy strongly depends on the atmosphere. Presence of Nitrogen alters the oxidation behavior of Ti5Si3 by nucleation and growth of nitride subscale. Ti5Si3.2 and Ti5Si3C0.5 alloys exhibited an excellent oxidation resistance in nitrogen bearing atmosphere due to limited dissolution of nitrogen and increased Si/Ti activity ratio. MoSi2 coating developed by pack cementation to protect Mo-based Mo-Si-B composites was found to be effective up to 1500ºC. Shifting coating composition to T1+T2+Mo3Si region showed the possibility to extend the coating lifetime above 1500ºC by more than ten times via formation of slow growing Mo3Si or T2 interlayer without sacrificing the oxidation resistance of the coating. The phase equilibria in the Nb-rich portion of Nb-B system has been evaluated experimentally using metallographic analysis and differential thermal analyzer (DTA). It was shown that Nbss (solid solution) and NbB are the only two primary phases in the 0-40 at.% B composition range, and the eutectic reaction L ↔ Nbss + NbB was determined to occur at 2104+/-5°C by DTA.

  2. Formation of silicides in annealed periodic multilayers

    NASA Astrophysics Data System (ADS)

    Maury, H.; Jonnard, P.; Le Guen, K.; André, J.-M.

    2009-05-01

    Periodic multilayers of nanometric period are widely used as optical components for the X-ray and extreme UV (EUV) ranges, in X-ray space telescopes, X-ray microscopes, EUV photolithography or synchrotron beamlines for example. Their optical performances depend on the quality of the interfaces between the various layers: chemical interdiffusion or mechanical roughness shifts the application wavelength and can drastically decrease the reflectance. Since under high thermal charge interdiffusion is known to get enhanced, the study of the thermal stability of such structures is essential to understand how interfacial compounds develop. We have characterized X-ray and EUV siliconcontaining multilayers (Mo/Si, Sc/Si and Mg/SiC) as a function of the annealing temperature (up to 600°C) using two non-destructive methods. X-ray emission from the silicon atoms, describing the Si valence states, is used to determine the chemical nature of the compounds present in the interphases while X-ray reflectivity in the hard and soft X-ray ranges can be related to the optical properties. In the three cases, interfacial metallic (Mo, Sc, Mg) silicides are evidenced and the thickness of the interphase increases with the annealing temperature. For Mo/Si and Sc/Si multilayers, silicides are even present in the as-prepared multilayers. Characteristic parameters of the stacks are determined: composition of the interphases, thickness and roughness of the layers and interphases if any. Finally, we have evidenced the maximum temperature of application of these multilayers to minimize interdiffusion.

  3. Synthesis and characterization of nanocrystalline silicide compounds

    SciTech Connect

    Karen, B.

    1992-01-03

    This thesis involves the investigation into the production of nanocrystalline silicide compounds by radio frequency inductively coupled plasma (RF-ICP) and mechanical milling. A system constructed which utilized a RF-ICP, a powder feed system and a condensation / collection chamber to produce nanocrystalline materials. Several silicides, such as Ti{sub 5}Si{sub 3}, Cr{sub 3}Si and MoSi{sub 2}, were fed into the plasma were they vaporized. The vaporized material then passed into a connecting chamber, where it condensed out of the vapor phase and the resulting powder was collected. Much of the work conducted was in designing and building of the systems components. This was followed by establishing the plasmas operating parameters. The material collected from the ICP chamber was then compared to material produced by mechanical milling. The material produced by both methods were characterized by x-ray diffraction, scanning and transmission-electron microscopy, and energy dispersive spectroscopy. The results indicate that it is possible to produce nanocrystalline material by mechanical milling; however, there is a significant amount of contamination from the milling ball and milling container. The results also show that the Ti{sub 5}Si{sub 3} and Cr{sub 3}Si compounds can be produced in nanocrystalline form by the ICP method. The resultant material collected from the ICP chamber following the MoSi{sub 2} run consisted of nanocrystalline Si and crystalline, Mo rich Si compound. Inductively coupled plasma - atomic emission spectroscopy (ICP-AES) was also used to observe the powders as they passed through the plasma. The resulting data indicates that each compound was vaporized and dissociated in the plasma. The following thesis describes the apparatus and experimental procedure used in producing nanocrystals.

  4. Structure and corrosion resistance of nickel coatings containing tungsten and silicon powders

    SciTech Connect

    Popczyk, Magdalena . E-mail: mpopczyk@us.edu.pl; Budniok, Antoni; Lagiewka, Eugeniusz

    2007-04-15

    Ni + W + Si coatings were prepared by nickel deposition from a bath containing a suspension of tungsten and silicon powders. These coatings were obtained at galvanostatic conditions, at the current density of j {sub dep} = - 0.100 A cm{sup -2} and at the temperature of 338 K. For determination of the influence of phase composition and surface morphology of these coatings on changes in the corrosion resistance, these coatings were modified in an argon atmosphere by thermal treatment at 1373 K during 1 h. A scanning electron microscope was used for surface morphology characterization of the coatings. The chemical composition of the coatings was determined by EDS and phase composition investigations were conducted by X-ray diffraction. It was found that the as-deposited coatings consist of a three-phase structure, i.e., nickel, tungsten and silicon. The phase composition for the Ni + W + Si coatings after thermal treatment is markedly different. The main peaks corresponding to Ni and W coexist with the new phases: NiW, NiWSi and a solid solution of W in Ni. Electrochemical corrosion resistance investigations were carried out in 5 M KOH, using potentiodynamic and electrochemical impedance spectroscopy (EIS) methods. On the basis of these investigations it was found that the Ni + W + Si coatings after thermal treatment are more corrosion resistant in alkaline solution than the as-deposited coatings. The reasons for this are a reduction in the amount of free nickel and tungsten, the presence of new phases (in particular polymetallic silicides), and a decrease of the active surface area of the coatings after thermal treatment.

  5. Superconducting nanowire networks formed on nanoporous membrane substrates

    NASA Astrophysics Data System (ADS)

    Luo, Qiong

    Introducing a regular array of holes into superconducting thin films has been actively pursued to stabilize and pin the vortex lattice against external driving forces, enabling higher current capabilities. If the width of the sections between neighboring holes is comparable to the superconducting coherence length, the circulation of the Cooper pairs in around the holes in the presence of a magnetic field can also produce the Little-Parks effect, i.e. periodic oscillation of the critical temperature. These two mechanisms, commensurate vortex pinning enhancement by the hole-array and the critical temperature oscillations of a wire network due to Little-Parks effect can induce similar experimental observations such as magnetoresistance oscillation and enhancement of the critical current at specific magnetic fields. This dissertation work investigates the effect of a hole-array on the properties of superconducting films deposited onto nanoporous substrates. Experiments on anisotropies of the critical temperature for niobium films on anodic aluminum oxide membrane substrates containing a regular hole-array reveal that the critical temperature exhibits two strong anisotropic effects: Little-Parks oscillations whose period varies with field direction superimposed on a smooth background arising from one dimensional confinement by the finite lateral space between neighboring holes. The two components of the anisotropy are intrinsically linked and appear in concert. That is, the hole-array changes the dimensionality of a two-dimensional (2D) film to a network of 1D nanowire network. Network of superconducting nanowires with transverse dimensions as small as few nanometers were achieved by coating molybdenum germanium (MoGe) layer onto commercially available filtration membranes which have extremely dense nanopores. The magnetoresistance, magnetic field dependence of the critical temperature and the anisotropies of the synthesized MoGe nanowire networks can be consistently

  6. The reactions of [MoCl(GeCl{sub 3})(CO){sub 3}(NCMe){sub 2}] with neutral Bi- and terdentate donor ligands

    SciTech Connect

    Baker, P.K.; Kendrick, D.

    1993-12-31

    The reaction of [MoCl(GeCl{sub 3})(CO){sub 3}(NCMe){sub 2}] with an equimolar quantity of LL (LL = 2,2{prime}-bipy, 1, 10-phen, Ph{sub 2}P(CH{sub 2}){sub n}PPh{sub 2} (N = 1 or 2)) in CH{sub 2}Cl{sub 2} at room temperature gave either [MoCl(GeCl{sub 3})(CO){sub 3}(LL)] (LL = 2,2{prime}-bipy or 1,10-phen) (1 and 2) or [MoCl(GeCl{sub 3})(CO){sub 2}(NCMe)(LL)](LL = Ph{sub 2}P(CH{sub 2}){sub n}PPh{sub 2} (n = 1 or 2) (3 or 4)), respectively. Equimolar quantities of [MoCl(GeCl{sub 3})(CO){sub 2}(NCMe)(Ph{sub 2}P(CH{sub 2})PPh{sub 2})](3) and LL (LL = 2,2{prime}-bipy or Ph{sub 2}P(CH){sub 2}PPh{sub 2}) react in CH{sub 2}Cl{sub 2} at room temperature to afford the cationic complexes [Mo(GeCl{sub 3})(CO){sub 2}(Ph{sub 2}P(CH{sub 2})PPh{sub 2})(LL)]Cl (5 and 6) in good yield. The cationic nature of 6 was established by chloride exchange by reacting Na[BPh{sub 4}] with 6 in acetonitrile to give the tetraphenylborate complex [Mo(GeCl{sub 3})(CO){sub 2}(Ph{sub 2}P(CH{sub 2})PPh{sub 2}){sub 2}][BPh{sub 4}] (7). Reaction of equimolar quantities of [MoCl(GeCl{sub 3})(CO){sub 3}(NCMe){sub 2}] and PhP(CH{sub 2}PPh{sub 2}){sub 2} in CH{sub 2}Cl{sub 2} at room temperature afforded the dicarbonyl complex [MoCl(GeCl{sub 3})(CO){sub 2}(PhP(CH{sub 2}CH{sub 2}PPh{sub 2}){sub 2})] (8) in good yield. 15 refs., 3 tabs.

  7. TOPICAL REVIEW: Quantum suppression of superconductivity in nanowires

    NASA Astrophysics Data System (ADS)

    Bezryadin, Alexey

    2008-01-01

    It is of fundamental importance to establish whether there is a limit to how thin a superconducting wire can be, while retaining its superconducting character—and if there is such limit, to understand what determines it. This issue may be of practical importance in defining the limit to miniaturization of superconducting electronic circuits. Recently, a new fabrication method, called molecular templating, was developed and used to answer such questions. In this approach, a suspended carbon nanotube is coated with a thin superconducting metal film, thus forming a superconducting nanowire. The wire obtained is automatically attached to the two leads formed by the sides of the trench. The usual material for such wires is the amorphous alloy of MoGe (Graybeal 1985 PhD Thesis Stanford University; Graybeal and Beasley 1984 Phys. Rev. B 29 4167; Yazdani and Kapitulnik 1995 Phys. Rev. Lett. 74 3037; Turneaure et al 2000 Phys. Rev. Lett. 84 987). Such wires typically exhibit a high degree of homogeneity and can be made very small: as thin as ~5 nm in diameter and as short as ~40 nm in length. The results of transport measurements on such homogeneous wires can be summarized as follows. Short wires, shorter than some empirical length, ~200 nm for MoGe, exhibit a clear dichotomy. They show either a superconducting behavior, with the resistance controlled by thermal fluctuations, or a weakly insulating behavior, with the resistance controlled by the weak Coulomb blockade. Thus a quantum superconductor-insulator transition (SIT) is indicated. Longer wires exhibit a gradual crossover behavior, from almost perfectly superconducting to normal or weakly insulating behavior, as their diameter is reduced. Measurements of wires, which are made inhomogeneous (granular) on purpose, show that such wires, even if they are short in the sense stated above, do not show a clear dichotomy, which could be identified as an SIT (Bollinger et al 2004 Phys. Rev. B 69 180503(R)). Thus

  8. X-ray supermirrors for BESSY II

    SciTech Connect

    Erko, A.; Schaefers, F.; Vidal, B.; Yakshin, A.; Pietsch, U.; Mahler, W.

    1995-10-01

    X-ray multilayer supermirrors for the energy range up to 20 keV have been theoretically studied and experimentally measured with synchrotron radiation. A multilayer mirror with 50 W/Si bilayers with different thicknesses on the Si substrate has a smooth reflectivity of up to 32% in the whole energy range from 5 to 22 keV at a grazing incidence angle of 0.32{degree} which is considerably larger than using total external reflection. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  9. Method of improving field emission characteristics of diamond thin films

    DOEpatents

    Krauss, Alan R.; Gruen, Dieter M.

    1999-01-01

    A method of preparing diamond thin films with improved field emission properties. The method includes preparing a diamond thin film on a substrate, such as Mo, W, Si and Ni. An atmosphere of hydrogen (molecular or atomic) can be provided above the already deposited film to form absorbed hydrogen to reduce the work function and enhance field emission properties of the diamond film. In addition, hydrogen can be absorbed on intergranular surfaces to enhance electrical conductivity of the diamond film. The treated diamond film can be part of a microtip array in a flat panel display.

  10. Method of improving field emission characteristics of diamond thin films

    DOEpatents

    Krauss, A.R.; Gruen, D.M.

    1999-05-11

    A method of preparing diamond thin films with improved field emission properties is disclosed. The method includes preparing a diamond thin film on a substrate, such as Mo, W, Si and Ni. An atmosphere of hydrogen (molecular or atomic) can be provided above the already deposited film to form absorbed hydrogen to reduce the work function and enhance field emission properties of the diamond film. In addition, hydrogen can be absorbed on intergranular surfaces to enhance electrical conductivity of the diamond film. The treated diamond film can be part of a microtip array in a flat panel display. 3 figs.

  11. Nose-Cone Calorimeter: upgrade of PHENIX detector

    NASA Astrophysics Data System (ADS)

    Chvala, Ondrej

    2008-10-01

    PHENIX experiment at RHIC is efficient at measuring processes involving rare probes, but has limited acceptance in azimuth and pseudorapidity (η). The Nose Cone Calorimeter (NCC), a W-Si sampling calorimeter in the region of 0.9,<η<,, is one of the upgrades which will dramatically increase coverage in azimuth and pseudorapidity. The NCC will expand PHENIX's precision measurements of electromagnetic probes in η, reconstruct jets, and enhance triggering capabilities. It will significantly contribute to measurements of γ-jets, quarkonia, and low-x nuclear structure functions. Details of the detector design, performance, and a sample of the physics topics which will benefit from the NCC, will be discussed.

  12. Superconductor-Metal-Insulator transition in two dimensional Ta thin Films

    NASA Astrophysics Data System (ADS)

    Park, Sun-Gyu; Kim, Eunseong

    2013-03-01

    Superconductor-insulator transition has been induced by tuning film thickness or magnetic field. Recent electrical transport measurements of MoGe, Bi, Ta thin films revealed an interesting intermediate metallic phase which intervened superconducting and insulating phases at certain range of magnetic field. Especially, Ta thin films show the characteristic IV behavior at each phase and the disorder tuned intermediate metallic phase [Y. Li, C. L. Vicente, and J. Yoon, Physical Review B 81, 020505 (2010)]. This unexpected metallic phase can be interpreted as a consequence of vortex motion or contribution of fermionic quasiparticles. In this presentation, we report the scaling behavior during the transitions in Ta thin film as well as the transport measurements in various phases. Critical exponents v and z are obtained in samples with wide ranges of disorder. These results reveal new universality class appears when disorder exceeds a critical value. Dynamical exponent z of Superconducting sample is found to be 1, which is consistent with theoretical prediction of unity. z in a metallic sample is suddenly increased to be approximately 2.5. This critical exponent is much larger than the value found in other system and theoretical prediction. We gratefully acknowledge the financial support by the National Research Foundation of Korea through the Creative Research Initiatives.

  13. Metallic Transport at the Insulator-Superconductor Transition

    NASA Astrophysics Data System (ADS)

    Kapitulnik, Aharon

    2000-03-01

    Analyses of experimental data on the superconductor to insulator transition in MoGe thin films suggest coupling of the system to a dissipative bath [1]. A phenomenology is developed to account for such coupling in which upon lowering the temperature the system can either be attracted by the "true" quantum critical point or driven away from it by dissipation [2]. Results on the disruption of scaling in quantum-Hall to insulator transition [3] and in arrays of Josephson-junctions are interpreted in a similar way, hence showing again the similarity among these problems[4]. 1. N. Mason and A. Kapitulnik, Phys. Rev. Lett. 82, 5341 (1999). 2. E. Shimshoni, A. Auerbach and A. Kapitulnik, Phys. Rev. Lett. 80, 3352 (1998). 3. D. Shahar, M. Hilke, C.C. Li, D.C. Tsui, S.L. Sondhi, J.E. Cunningham, and M. Razeghi, Sol. St. Comm. 107, 19 (1998). 4. S. Kivelson, D.H. Lee, and S.-C. Zhang, Phys. Rev. B 46, 2223 (1992).

  14. Quantum creep in a highly crystalline two-dimensional superconductor

    NASA Astrophysics Data System (ADS)

    Saito, Yu; Kasahara, Yuichi; Ye, Jianting; Iwasa, Yoshihiro; Nojima, Tsutomu

    Conventional studies on quantum phase transitions, especially on superconductor-insulator or superconductor-metal-insulator transitions have been performed in deposited metallic thin films such as Bismuth or MoGe. Although the techniques of thin films deposition have been considerably improved, unintentional disorder such as impurities and deficiencies, generating the pinning centers, seems to still exist in such systems. The mechanical exfoliated highly crystalline two-dimensional material can be a good candidate to realize a less-disordered 2D superconductor with extremely weak pinning, combined with transfer method or ionic-liquid gating. We report on the quantum metal, namely, magnetic-field-induced metallic state observed in an ion-gated two-dimensional superconductor based on an ultra-highly crystalline layered band insulator, ZrNCl. We found that the superconducting state is extremely fragile against external magnetic fields; that is, zero resistance state immediately disappears, once an external magnetic field switches on. This is because the present system is relatively clean and the pinning potential is extremely weak, which cause quantum tunneling and flux flow of vortices, resulting in metallic ground state.

  15. Quantum melting of a two-dimensional vortex lattice at zero temperature

    SciTech Connect

    Rozhkov, A.; Stroud, D.

    1996-11-01

    We consider the quantum melting of a two-dimensional flux lattice at temperature {ital T} = 0 in the {open_quote}{open_quote}superclean limit.{close_quote}{close_quote} In this regime, we find that vortex motion is dominated by the Magnus force. A Lindemann criterion predicts melting when {ital n}{sub {ital v}}/{ital n}{sub {ital p}}{ge}{beta}, where {ital n}{sub {ital v}} and {ital n}{sub {ital p}} are the areal number densities of vortex pancakes and Cooper pairs, and {beta}{approx_equal}0.1. A second criterion is derived by using Wigner-crystal and Laughlin wave functions for the solid and liquid phases respectively, and setting the two energies equal. This gives a melting value similar to the Lindemann result. We discuss the numerical value of the {ital T}=0 melting field for thin layers of a low-{ital T}{sub {ital c}} superconductor, such as {ital a}-MoGe, and single layers of high-{ital T}{sub {ital c}} materials. {copyright} {ital 1996 The American Physical Society.}

  16. Life testing of conductively coupled thermoelectric cells. Final report for task 11

    SciTech Connect

    Kelley, E.; Klee, P.; Hanson, J.; Nakahara, J.

    1997-09-26

    Four conductively coupled thermoelectric cells, developed under the SP100 program, have been life tested. These cells, referred to as TOC (Task Order Contract) cells, were fourth generation cells, and incorporated design improvements to extend operating life. GS526 glass had been added to suppress the loss of Ge from the MoGe bond between the SiGe and the barrier graphite. The previous generation was life limited by the degradation of this electrical bond at the SiGe to graphite hot side interface due to the Ge loss. This led to abnormal internal resistance trends. The TOC cell test data and post test diagnostic have confirmed the effectiveness of the perimeter glass. Three of the four cells demonstrated normal electrical performance trends. The fourth cell (No. 139) tested at JPL showed an abnormal increase in internal resistance and a shift in temperature levels at 12,400 hours following a facility shutdown and restart. When the cell was removed from the test fixture, separation occurred between the hot side compliant pad facesheet and the niobium filament bundles. No degradation of the bond between the SiGe and the barrier graphite was found and the change in slope of the internal resistance was attributed to changes in the rate of dopant precipitation caused by the shift in temperature levels.

  17. Triplet proximity effect in superconducting heterostructures with a half-metallic layer

    NASA Astrophysics Data System (ADS)

    Mironov, S.; Buzdin, A.

    2015-11-01

    We present the Usadel theory describing the superconducting proximity effect in heterostructures with a half-metallic layer. It is shown that the full spin polarization inside the half-metals gives rise to an additional component of the Green's function which results in the giant triplet spin-valve effect in superconductor (S)-ferromagnet (F)-half-metal (HM) trilayers and provides a natural explanation for the φ0-junction formation in the S/F/HM/F/S systems. In addition, we consider the exactly solvable model of the S/F/HM trilayers of atomic thickness and demonstrate that it reproduces the main features of the spin-valve effect found within the Usadel approach. Our results are shown to be in qualitative agreement with the recent experimental data on the spin-valve effect in MoGe /Ni /Cu /CrO2 hybrids [Singh et al., Phys. Rev. X 5, 021019 (2015), 10.1103/PhysRevX.5.021019].

  18. Practical resolution enhancement effect by new complete antireflective layer in KrF excimer laser lithography

    NASA Astrophysics Data System (ADS)

    Ogawa, Tohru; Kimura, Mitsumori; Gocho, Tetsuo; Tomo, Yoichi; Tsumori, Toshiro

    1993-08-01

    A new complete anti-reflective layer (ARL) for KrF excimer laser lithography, which becomes an excimer laser lithography to a practical mass production tool beyond 0.35 micrometers rule devices, is developed. This new ARL, whose material is a type of hydro silicon oxynitride film (SiOxNy:H), can be applied to tungsten silicide (W-Si) and even to aluminum silicon (Al- Si) substrates by controlling deposition conditions in plasma enhanced chemical vapor deposition systems. Using this SiOxNy:H film with 30 nm and 25 nm thicknesses on W-Si and Al-Si substrates respectively, critical dimension variations for both substrates are drastically reduced to within 0.02 micrometers for 0.30 micrometers imaging. On actual device structures, with these SiOxNy:H film as an ARL, notching effects by halation are completely reduced. Moreover, these SiOxNy:H film can not only be deposited with topographical uniformity but also etched with conventional SiO2 etching conditions. Another advantage with ARL is a depth of focus enhancement effect. With a SiOxNy:H film depth of focus for the critical dimension is enlarged more than 23% for 0.35 micrometers line and space patterns. Accordingly, practical resolution is enhanced. From the above effect, the limitations of KrF excimer laser lithography for ideal substrate conditions are considered from the point of view of optimal projection lens NA for various feature sizes.

  19. Geometry-dependent phase, stress state and electrical properties in nickel-silicide nanowires

    NASA Astrophysics Data System (ADS)

    Wang, C. C.; Lai, W. T.; Hsiao, Y. Y.; Chen, I. H.; George, T.; Li, P. W.

    2016-05-01

    We report that the geometry of single-crystalline Si nanowires (NWs) prior to salicidation at 500 °C is the key factor controlling the phase, stress state, and electrical resistivity of the resulting Ni x Si y NWs of width less than 100 nm. This is a radical departure from previous observations of a single phase formation for nickel silicides generated from the silicidation of bulk Si substrates. The phase transition from NiSi for large NWs ( W Si NW  =  250–450 nm) to Ni2Si for small NWs ( W Si NW  =  70–100 nm) is well correlated with the observed volumetric expansion and electrical resistivity variation with the NW width. For the extremely small dimensions of Ni x Si y NWs, we propose that the preeminent, kinetics-based Zhang and d’Heurle model for salicidation be modified to a more thermodynamically-governed, volume-expansion dependent Ni x Si y phase formation. A novel, plastic deformation mechanism is proposed to explain the observed, geometry-dependent Ni x Si y NW phase formation that also strongly influences the electrical performance of the NWs.

  20. Tungsten diffusion in silicon

    SciTech Connect

    De Luca, A.; Texier, M.; Burle, N.; Oison, V.; Pichaud, B.; Portavoce, A.; Grosjean, C.

    2014-01-07

    Two doses (10{sup 13} and 10{sup 15} cm{sup −2}) of tungsten (W) atoms were implanted in different Si(001) wafers in order to study W diffusion in Si. The samples were annealed or oxidized at temperatures between 776 and 960 °C. The diffusion profiles were measured by secondary ion mass spectrometry, and defect formation was studied by transmission electron microscopy and atom probe tomography. W is shown to reduce Si recrystallization after implantation and to exhibit, in the temperature range investigated, a solubility limit close to 0.15%–0.2%, which is higher than the solubility limit of usual metallic impurities in Si. W diffusion exhibits unusual linear diffusion profiles with a maximum concentration always located at the Si surface, slower kinetics than other metals in Si, and promotes vacancy accumulation close to the Si surface, with the formation of hollow cavities in the case of the higher W dose. In addition, Si self-interstitial injection during oxidation is shown to promote W-Si clustering. Taking into account these observations, a diffusion model based on the simultaneous diffusion of interstitial W atoms and W-Si atomic pairs is proposed since usual models used to model diffusion of metallic impurities and dopants in Si cannot reproduce experimental observations.

  1. Self-induced uniaxial strain in MoS2 monolayers with local van der Waals-stacked interlayer interactions.

    PubMed

    Zhang, Kenan; Hu, Shuhong; Zhang, Yun; Zhang, Tianning; Zhou, Xiaohao; Sun, Yan; Li, Tian-Xin; Fan, Hong Jin; Shen, Guozhen; Chen, Xin; Dai, Ning

    2015-03-24

    Strain engineering is an effective method to tune the properties of electrons and phonons in semiconductor materials, including two-dimensional (2D) layered materials (e.g., MoS2 or graphene). External artificial stress (ExAS) or heterostructure stacking is generally required to induce strains for modulating semiconductor bandgaps and optoelectronic functions. For layered materials, the van der Waals-stacked interlayer interaction (vdW-SI) has been considered to dominate the interlayer stacking and intralayer bonding. Here, we demonstrate self-induced uniaxial strain in the MoS2 monolayer without the assistance of ExAS or heterostructure stacking processes. The uniaxial strain occurring in local monolayer regions is manifested by the Raman split of the in-plane vibration modes E2g(1) and is essentially caused by local vdW-SI within the single layer MoS2 due to a unique symmetric bilayer stacking. The local stacked configuration and the self-induced uniaxial strain may provide improved understanding of the fundamental interlayer interactions and alternative routes for strain engineering of layered structures. PMID:25716291

  2. Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development

    NASA Astrophysics Data System (ADS)

    O'Sullivan, Gerry; Li, Bowen; D'Arcy, Rebekah; Dunne, Padraig; Hayden, Paddy; Kilbane, Deirdre; McCormack, Tom; Ohashi, Hayato; O'Reilly, Fergal; Sheridan, Paul; Sokell, Emma; Suzuki, Chihiro; Higashiguchi, Takeshi

    2015-07-01

    The primary requirement for the development of tools for extreme ultraviolet lithography (EUVL) has been the identification and optimization of suitable sources. These sources must be capable of producing hundreds of watts of extreme ultraviolet (EUV) radiation within a wavelength bandwidth of 2% centred on 13.5 nm, based on the availability of Mo/Si multilayer mirrors (MLMs) with a reflectivity of ˜70% at this wavelength. Since, with the exception of large scale facilities, such as free electron lasers, such radiation is only emitted from plasmas containing moderately to highly charged ions, the source development prompted a large volume of studies of laser produced and discharge plasmas in order to identify which ions were the strongest emitters at this wavelength and the plasma conditions under which their emission was optimized. It quickly emerged that transitions of the type 4p64dn - 4p54dn+1 + 4dn-14f in the spectra of Sn IX to SnXIV were the best candidates and work is still ongoing to establish the plasma conditions under which their emission at 13.5 nm is maximized. In addition, development of other sources at 6.X nm, where X ˜ 0.7, has been identified as the wavelength of choice for so-called Beyond EUVL (BEUVL), based on the availability of La/B based MLMs, with theoretical reflectance approaching 80% at this wavelength. Laser produced plasmas of Gd and Tb have been identified as potential source elements, as n = 4 - n = 4 transitions in their ions emit strongly near this wavelength. However to date, the highest conversion efficiency (CE) obtained, for laser to BEUV energy emitted within the 0.6% wavelength bandwidth of the available mirrors is only 0.8%, compared with values of 5% for the 2% bandwidth relevant for the Mo/Si mirrors at 13.5 nm. This suggests a need to identify other potential sources or the selection of other wavelengths for BEUVL. This review deals with the atomic physics of the highly-charged ions relevant to EUV emission at these

  3. Electron beam inspection of 16nm HP node EUV masks

    NASA Astrophysics Data System (ADS)

    Shimomura, Takeya; Narukawa, Shogo; Abe, Tsukasa; Takikawa, Tadahiko; Hayashi, Naoya; Wang, Fei; Ma, Long; Lin, Chia-Wen; Zhao, Yan; Kuan, Chiyan; Jau, Jack

    2012-11-01

    EUV lithography (EUVL) is the most promising solution for 16nm HP node semiconductor device manufacturing and beyond. The fabrication of defect free EUV mask is one of the most challenging roadblocks to insert EUVL into high volume manufacturing (HVM). To fabricate and assure the defect free EUV masks, electron beam inspection (EBI) tool will be likely the necessary tool since optical mask inspection systems using 193nm and 199nm light are reaching a practical resolution limit around 16nm HP node EUV mask. For production use of EBI, several challenges and potential issues are expected. Firstly, required defect detection sensitivity is quite high. According to ITRS roadmap updated in 2011, the smallest defect size needed to detect is about 18nm for 15nm NAND Flash HP node EUV mask. Secondly, small pixel size is likely required to obtain the high sensitivity. Thus, it might damage Ru capped Mo/Si multilayer due to accumulated high density electron beam bombardments. It also has potential of elevation of nuisance defects and reduction of throughput. These challenges must be solved before inserting EBI system into EUV mask HVM line. In this paper, we share our initial inspection results for 16nm HP node EUV mask (64nm HP absorber pattern on the EUV mask) using an EBI system eXplore® 5400 developed by Hermes Microvision, Inc. (HMI). In particularly, defect detection sensitivity, inspectability and damage to EUV mask were assessed. As conclusions, we found that the EBI system has capability to capture 16nm defects on 64nm absorber pattern EUV mask, satisfying the sensitivity requirement of 15nm NAND Flash HP node EUV mask. Furthermore, we confirmed there is no significant damage to susceptible Ru capped Mo/Si multilayer. We also identified that low throughput and high nuisance defect rate are critical challenges needed to address for the 16nm HP node EUV mask inspection. The high nuisance defect rate could be generated by poor LWR and stitching errors during EB writing

  4. Emissivity enhancement coatings for thermophotovoltaic (TPV) radiator applications

    SciTech Connect

    Yue, J.J.; Cockeram, B.V.

    1998-12-01

    Ten emissivity enhancing coatings (ZrO{sub 2} + 18% TiO{sub 2} + 10% Y{sub 2}O{sub 3}, Cr{sub 2}O{sub 3}, ZrC, Fe{sub 2}TiO{sub 5}, ZrTiO{sub 4}, ZrO{sub 2} + 8% Y{sub 2}O{sub 3} + 2% HfO{sub 2}, TiC, TiC + 5% Al{sub 2}O{sub 3} + 5% TiO{sub 2}, ZrB{sub 2}, and ZrB{sub 2} + 10% MoSi{sub 2}) deposited on Mo, Nb, and Haynes 230 substrates were evaluated for potential use in thermophotovoltaic (TPV) radiator applications. Emissivity testing of as-coated and annealed coupons indicate that 5 of the 10 Vacuum Plasma Spray (VPS) coating candidates have promise (ZrO{sub 2} + 18% TiO{sub 2} + 10% Y{sub 2}O{sub 3}, ZrC, Fe{sub 2}TiO{sub 5}, ZrTiO{sub 4}, ZrO{sub 2} + 8% Y{sub 2}O{sub 3} + 2% HfO{sub 2}). Four of the ten coatings have emissivity values that are too low to be of further interest (TiC, TiC + 5% Al{sub 2}O{sub 3} + 5% TiO{sub 2}, ZrB{sub 2}, and ZrB{sub 2} + 10% MoSi{sub 2}). The final coating was mostly Cr{sub 2}O{sub 3}, and exhibited excessive evaporation during vacuum annealing with a significant decrease in emissivity. Base metal powder, which was added to the bond layer of all coatings to improve coating adhesion, was detected in the top layer of the coatings. Differences in reactive interaction between the base metal powder and coating during vacuum annealing produced varying changes in emissivity. A small decrease in emissivity was observed for the ZrC coating deposited on niobium, which agrees with the limited interaction between the niobium base metal particles and the ZrC coating detected in SEM/EDS examinations. A large decrease in emissivity was observed for the ZrC coating deposited on Haynes 230, and significant interaction between the base metal particles and ZrC coating was observed.

  5. Extreme ultraviolet lithography mask etch study and overview

    NASA Astrophysics Data System (ADS)

    Wu, Banqiu; Kumar, Ajay; Chandrachood, Madhavi; Sabharwal, Amitabh

    2013-04-01

    An overview of extreme ultraviolet lithography (EUVL) mask etch is presented and a EUVL mask etch study was carried out. Today, EUVL implementation has three critical challenges that hinder its adoption: extreme ultraviolet (EUV) source power, resist resolution-line width roughness-sensitivity, and a qualified EUVL mask. The EUVL mask defect challenges result from defects generated during blank preparation, absorber and multilayer deposition processes, as well as patterning, etching and wet clean processes. Stringent control on several performance criteria including critical dimension (CD) uniformity, etch bias, micro-loading, profile control, defect control, and high etch selectivity requirement to capping layer is required during the resist pattern duplication on the underlying absorber layer. EUVL mask absorbers comprise of mainly tantalum-based materials rather than chrome- or MoSi-based materials used in standard optical masks. Compared to the conventional chrome-based absorbers and phase shift materials, tantalum-based absorbers need high ion energy to obtain moderate etch rates. However, high ion energy may lower resist selectivity, and could introduce defects. Current EUVL mask consists of an anti-reflective layer on top of the bulk absorber. Recent studies indicate that a native oxide layer would suffice as an anti-reflective coating layer during the electron beam inspection. The absorber thickness and the material properties are optimized based on optical density targets for the mask as well as electromagnetic field effects and optics requirements of the patterning tools. EUVL mask etch processes are modified according to the structure of the absorber, its material, and thickness. However, etch product volatility is the fundamental requirement. Overlapping lithographic exposure near chip border may require etching through the multilayer, resulting in challenges in profile control and etch selectivity. Optical proximity correction is applied to further

  6. Interlaced X-ray diffraction computed tomography

    PubMed Central

    Vamvakeros, Antonios; Jacques, Simon D. M.; Di Michiel, Marco; Senecal, Pierre; Middelkoop, Vesna; Cernik, Robert J.; Beale, Andrew M.

    2016-01-01

    An X-ray diffraction computed tomography data-collection strategy that allows, post experiment, a choice between temporal and spatial resolution is reported. This strategy enables time-resolved studies on comparatively short timescales, or alternatively allows for improved spatial resolution if the system under study, or components within it, appear to be unchanging. The application of the method for studying an Mn–Na–W/SiO2 fixed-bed reactor in situ is demonstrated. Additionally, the opportunities to improve the data-collection strategy further, enabling post-collection tuning between statistical, temporal and spatial resolutions, are discussed. In principle, the interlaced scanning approach can also be applied to other pencil-beam tomographic techniques, like X-ray fluorescence computed tomography, X-ray absorption fine structure computed tomography, pair distribution function computed tomography and tomographic scanning transmission X-ray microscopy. PMID:27047305

  7. A monochromator based on W/C multilayers of 40 A layer spacing

    NASA Technical Reports Server (NTRS)

    Smith, A.; Riedel, C.; Edwards, B.; Savage, D.; Lai, B.

    1988-01-01

    The design and preliminary performance data are presented for a monochromator based on two multilayer X-ray mirrors. The monochromator is based on mirrors with a d-spacing of 40 A and is designed to operate in the 5-75 A wavelength regime which can be varied by interchanging the mirrors with ones of different d-spacing. The multilayer mirrors are fabricated using sputter deposition and typically consist of 40 layer pairs of W and C. Except for W/Si, which shows 1-2 percent better reflectivities over the 7-40 A range but 4-10 percent poorer reflectivities for wavelengths longer than 40 A and shorter than 7 A, calculations performed using other combinations of materials generally show poorer reflectivities over the wavelength range of interest. Plans for a four-mirror version of the monochromator that will have increased resolution are also presented.

  8. Optical constants for hard x-ray multilayers over the energy range E = 35 - 180 keV

    NASA Astrophysics Data System (ADS)

    Windt, David L.; Donguy, Soizik; Hailey, Charles J.; Koglin, Jason E.; Honkimaki, Veijo; Ziegler, Eric; Christensen, Finn E.; Harrison, Fiona A.

    2004-02-01

    We have determined experimentally optical constants for eight thin film materials that can be used in hard X-ray multilayer coatings. Thin film samples of Ni.97V.03, Mo, W, Pt, C, B4C, Si and SiC were deposited by magnetron sputtering onto superpolished optical flats. Optical constants were determined from fits to reflectance-vs-incidence angle measurements made using synchrotron radiation over the energy range E=35 180 keV. We have also measured the X-ray reflectance of a prototype W/SiC multilayer coating over the energy range E=35 100 keV, and we compare the measured reflectance with a calculation using the newly derived optical constants.

  9. Production and performance of multilayer-coated conical x-ray mirrors

    NASA Astrophysics Data System (ADS)

    Ulmer, Melville P.; Altkorn, Robert; Graham, Michael E.; Madan, Anita; Chu, Yong S.

    2003-12-01

    A method of fabricating replica figured x-ray optics with integral multilayer coatings is presented. With the intact electroforming multilayer process (IEMP) technique, we sputter multilayers onto a reusable superpolished mandrel, electroform nickel over the multilayers, and remove the multilayer-coated nickel shell intact from the mandrel. This approach offers advantages over more traditional, original, and segmented-replica fabrication techniques, including low cost; compatibility with a wide range of mirror designs, diameters, and focal lengths; simple integration with multilayer sputtering processes; and the ability to produce complete shells of revolution. The fabrication of W/Si multilayer-coated 10-cm-diameter conical x-ray mirrors is described, as are reflectivity measurements at 10 and 30 keV. The measured reflectivity of the IEMP multilayers at the 10-keV primary Bragg peak was 17%. Measurements of multiple points on the cone showed multilayer uniformity to within a few percent around the mirror.

  10. Silicon Carbide (SiC) Power Processing Unit (PPU) for Hall Effect Thrusters

    NASA Technical Reports Server (NTRS)

    Reese, Bradley

    2015-01-01

    Arkansas Power Electronics International (APEI), Inc., is developing a high-efficiency, radiation-hardened 3.8-kW SiC power supply for the PPU of Hall effect thrusters. This project specifically targets the design of a PPU for the high-voltage Hall accelerator (HiVHAC) thruster, with target specifications of 80- to 160-V input, 200- to 700-V/5A output, efficiency greater than 96 percent, and peak power density in excess of 2.5 kW/kg. The PPU under development uses SiC junction field-effect transistor power switches, components that APEI, Inc., has irradiated under total ionizing dose conditions to greater than 3 MRad with little to no change in device performance.

  11. Investigation of Miniaturized Radioisotope Thermionic Power Generation for General Use

    NASA Technical Reports Server (NTRS)

    Duzik, Adam J.; Choi, Sang H.

    2016-01-01

    Radioisotope thermoelectric generators (RTGs) running off the radioisotope Pu238 are the current standard in deep space probe power supplies. While reliable, these generators are very inefficient, operating at only approx.7% efficiency. As an alternative, more efficient radioisotope thermionic emission generators (RTIGs) are being explored. Like RTGs, current RTIGs concepts use exotic materials for the emitter, limiting applicability to space and other niche applications. The high demand for long-lasting mobile power sources would be satisfied if RTIGs could be produced inexpensively. This work focuses on exposing several common materials, such as Al, stainless steel, W, Si, and Cu, to elevated temperatures under vacuum to determine the efficiency of each material as inexpensive replacements for thermoelectric materials.

  12. Nose-cone calorimeter: PHENIX forward upgrade

    NASA Astrophysics Data System (ADS)

    Chvala, Ondrej

    2009-07-01

    PHENIX is a high rate experiment efficient at measuring rare processes, but has limited acceptance in azimuth and pseudorapidity ( η). The Nose Cone Calorimeter (NCC), a W-Si sampling calorimeter in the region of 0.9< η<3, is one of the upgrades which will significantly increase coverage in both azimuth and pseudorapidity. The NCC will expand PHENIX’s precision measurements of electromagnetic probes in η, reconstruct jets, perform a wide scope of correlation measurements, and enhance triggering capabilities. The detector will significantly contribute to measurements of γ-jet correlations, quarkonia production, and low- x nuclear structure functions. This report discusses details of the detector design and its performance concerning a sample of the physics topics which will benefit from the NCC. In view of recent funding difficulties, outlook of the activities is discussed.

  13. Growth of WSi2 in phosphorous-implanted W/«Si» couples

    NASA Astrophysics Data System (ADS)

    Ma, E.; Lim, B. S.; Nicolet, M.-A.; Alvi, N. S.; Hamdi, A. H.

    1988-05-01

    The thermal reaction of rf-sputter-deposited tungsten films with a (100) silicon substrate is investigated by vacuum furnace annealing and rapid thermal annealing. An irradiation of the W/Si interface by a phosphorous ion beam at room temperature prior to annealing promotes a uniform interfacial growth of WSi2. The growth of WSi2 follows diffusion-controlled kinetics during both furnace annealing and rapid thermal processing. A growth law of x2 = kt is obtained for furnace annealing between 690 and 740° C, where x is the thickness of the compound, t is the annealing duration after an initial incubation period and k = 62 (cm2/s) exp (--3.0 eV/kT). The surface smoothness of the suicide films improves with increasing ion dose.

  14. Tests of variable-band multilayers designed for investigating optimal signal-to-noise vs artifact signal ratios in Dual-Energy Digital Subtraction Angiography (DDSA) imaging systems

    SciTech Connect

    Boyers, D.; Ho, A.; Li, Q.; Piestrup, M.; Rice, M.; Tatchyn, R.

    1993-08-01

    In recent work, various design techniques were applied to investigate the feasibility of controlling the bandwidth and bandshape profiles of tungsten/boron-carbon (W/B{sub 4}C) and tungsten/silicon (W/Si) multilayers for optimizing their performance in synchrotron radiation based angiographical imaging systems at 33 keV. Varied parameters included alternative spacing geometries, material thickness ratios, and numbers of layer pairs. Planar optics with nominal design reflectivities of 30%--94% and bandwidths ranging from 0.6%--10% were designed at the Stanford Radiation Laboratory, fabricated by the Ovonic Synthetic Materials Company, and characterized on Beam Line 4-3 at the Stanford Synchrotron Radiation Laboratory, in this paper we report selected results of these tests and review the possible use of the multilayers for determining optimal signal to noise vs. artifact signal ratios in practical Dual-Energy Digital Subtraction Angiography systems.

  15. X-ray beamsplitter

    DOEpatents

    Ceglio, Natale M.; Stearns, Daniel S.; Hawryluk, Andrew M.; Barbee, Jr., Troy W.

    1989-01-01

    An x-ray beamsplitter which splits an x-ray beam into two coherent parts by reflecting and transmitting some fraction of an incident beam has applications for x-ray interferometry, x-ray holography, x-ray beam manipulation, and x-ray laser cavity output couplers. The beamsplitter is formed of a wavelength selective multilayer thin film supported by a very thin x-ray transparent membrane. The beamsplitter resonantly transmits and reflects x-rays through thin film interference effects. A thin film is formed of 5-50 pairs of alternate Mo/Si layers with a period of 20-250 A. The support membrane is 10-200 nm of silicon nitride or boron nitride. The multilayer/support membrane structure is formed across a window in a substrate by first forming the structure on a solid substrate and then forming a window in the substrate to leave a free-standing structure over the window.

  16. Lasers, extreme UV and soft X-ray

    DOE PAGESBeta

    Nilsen, Joseph

    2015-09-20

    Three decades ago, large ICF lasers that occupied entire buildings were used as the energy sources to drive the first X-ray lasers. Today X-ray lasers are tabletop, spatially coherent, high-repetition rate lasers that enable many of the standard optical techniques such as interferometry to be extended to the soft X-ray regime between wavelengths of 10 and 50 nm. Over the last decade X-ray laser performance has been improved by the use of the grazing incidence geometry, diode-pumped solid-state lasers, and seeding techniques. The dominant X-ray laser schemes are the monopole collisional excitation lasers either driven by chirped pulse amplification (CPA)more » laser systems or capillary discharge. The CPA systems drive lasing in neon-like or nickel-like ions, typically in the 10 – 30 nm range, while the capillary system works best for neon-like argon at 46.9 nm. Most researchers use nickel-like ion lasers near 14 nm because they are well matched to the Mo:Si multilayer mirrors that have peak reflectivity near 13 nm and are used in many applications. As a result, the last decade has seen the birth of the X-ray free electron laser (XFEL) that can reach wavelengths down to 0.15 nm and the inner-shell Ne laser at 1.46 nm.« less

  17. X-ray beamsplitter

    DOEpatents

    Ceglio, N.M.; Stearns, D.G.; Hawryluk, A.M.; Barbee, T.W. Jr.

    1987-08-07

    An x-ray beamsplitter which splits an x-ray beam into two coherent parts by reflecting and transmitting some fraction of an incident beam has applications for x-ray interferometry, x-ray holography, x-ray beam manipulation, and x-ray laser cavity output couplers. The beamsplitter is formed of a wavelength selective multilayer thin film supported by a very thin x-ray transparent membrane. The beamsplitter resonantly transmits and reflects x-rays through thin film interference effects. A thin film is formed of 5--50 pairs of alternate Mo/Si layers with a period of 20--250 A. The support membrane is 10--200 nm of silicon nitride or boron nitride. The multilayer/support membrane structure is formed across a window in a substrate by first forming the structure on a solid substrate and then forming a window in the substrate to leave a free-standing structure over the window. 6 figs.

  18. SiC (SCS-6) Fiber Reinforced-Reaction Formed SiC Matrix Composites: Microstructure and Interfacial Properties

    NASA Technical Reports Server (NTRS)

    Singh, M.; Dickerson, R. M.; Olmstead, Forrest A.; Eldridge, J. I.

    1997-01-01

    Microstructural and interfacial characterization of unidirectional SiC (SCS-6) fiber reinforced-reaction formed SiC (RFSC) composites has been carried out. Silicon-1.7 at.% molybdenum alloy was used as the melt infiltrant, instead of pure silicon, to reduce the activity of silicon in the melt as well as to reduce the amount of free silicon in the matrix. Electron microprobe analysis was used to evaluate the microstructure and phase distribution in these composites. The matrix is SiC with a bi-modal grain-size distribution and small amounts of MoSi2, silicon, and carbon. Fiber push-outs tests on these composites showed that a desirably low interfacial shear strength was achieved. The average debond shear stress at room temperature varied with specimen thickness from 29 to 64 MPa, with higher values observed for thinner specimens. Initial frictional sliding stresses showed little thickness dependence with values generally close to 30 MPa. Push-out test results showed very little change when the test temperature was increased to 800 C from room temperature, indicating an absence of significant residual stresses in the composite.

  19. Efficiency calibration of the first multilayer-coated holographic ion-etched flight grating for a sounding rocket high-resolution spectrometer

    SciTech Connect

    Kowalski, Michael P.; Barbee, Troy W. Jr.; Heidemann, Klaus F.; Gursky, Herbert; Rife, Jack C.; Hunter, William R.; Fritz, Gilbert G.; Cruddace, Raymond G.

    1999-11-01

    We have fabricated the four flight gratings for a sounding rocket high-resolution spectrometer using a holographic ion-etching technique. The gratings are spherical (4000-nm radius of curvature), large (160 mmx90 mm), and have a laminar groove profile of high density (3600 grooves/mm). They have been coated with a high-reflectance multilayer of Mo/Si. Using an atomic force microscope, we examined the surface characteristics of the first grating before and after multilayer coating. The average roughness is approximately 3 Aa rms after coating. Using synchrotron radiation, we completed in efficiency calibration map over the wavelength range 225-245 Aa. At an angle of incidence of 5 degree sign and a wavelength of 232 Aa, the average efficiency in the first inside order is 10.4{+-}0.5%, and the derived groove efficiency is 34.8{+-}1.6%. These values exceed all previously published results for a high-density grating. (c) 1999 Optical Society of America.

  20. EUV mask process development status for full field EUV exposure tool

    NASA Astrophysics Data System (ADS)

    Abe, Tsukasa; Adachi, Takashi; Akizuki, Hideo; Mohri, Hiroshi; Hayashi, Naoya; Ishikiriyama, Kosuke

    2008-05-01

    Extreme Ultra Violet Lithography (EUVL) is one of promising candidates for next generation lithography, 32nm node and beyond. Authors are developing EUV mask process targeting full field EUV exposure tool. Unlike the conventional optical mask, EUV mask is reflective type mask. To reflect 13.5nm wavelength light, 40 pairs of Mo/Si multilayer (ML) is used for reflective layer. Reflective layer is covered by capping layer. The capping layer protect reflective layer from absorber etching, defect repair and environmental condition. Top of absorber layer is covered by low reflective (LR) layer to achieve high contrast between the etched and not etched portion. Back side of EUV mask is covered by conductive film for electrostatic chuck use. In this paper, we will report current process development status of EUV mask for full field EUV exposure tool. Absorber patterning process including resist patterning and absorber etching were developed. Thin resist use and small resist damage dry etching process achieved pattern resolution of 32nm node. Defect inspection was also evaluated using DUV reticle inspection tool. Ta-based absorber on ruthenium (Ru) capped ML blanks was used for this evaluation. Because, Ru material has high resistivity to absorber etching plasma, it enable buffer layer less EUV mask structure. Ru also has better property on oxidation resistance compared to standard silicon (Si) capping layer.

  1. Microstructural evolution and mechanical behavior of nickel-based superalloy 625 made by selective laser melting

    NASA Astrophysics Data System (ADS)

    Witkin, David B.; Adams, Paul; Albright, Thomas

    2015-03-01

    The mechanical properties and microstructures of Selective Laser Melted (SLM) alloy 625 procured from different suppliers were compared. The post-SLM process of hot isostatic pressing (HIP) led to a relatively coarse recrystallized gamma matrix phase that was similar in all the suppliers' materials, resulting in nearly identical tensile properties. These similarities obscure significant differences between them with respect to the population of second phase particles, which consisted of carbides or Laves phase. During solidification, the final liquid phase is concentrated in Nb, Mo, Si and C, and leads to L --> γ + carbide/Laves eutectic reactions. Secondary particles are very small prior to HIP and their composition has not been analyzed yet, but are limited to the fine-grained eutectic regions of the material prior to HIP. During HIP the gamma phase recrystallizes to remove the original as-solidified SLM microstructure, but secondary particles nucleate and grow where their elemental constituents first solidified, leading to a non-homogeneous distribution. Quasi-static tensile properties do not appear to be sensitive to these differences, but it is likely that other mechanical properties will be affected, especially fatigue and fracture behavior. Surface roughness, large grain size, and pores and voids left unhealed by the HIP cycle will also influence fatigue and fracture. Surface roughness and porosity in particular are features that could be improved by implementing novel approaches to laser processing in SLM.

  2. Novel Accident-Tolerant Fuel Meat and Cladding

    SciTech Connect

    Robert D. Mariani; Pavel G Medvedev; Douglas L Porter; Steven L Hayes; James I. Cole; Xian-Ming Bai

    2013-09-01

    A novel accident-tolerant fuel meat and cladding are here proposed. The fuel meat design incorporates annular fuel with inserts and discs that are fabricated from a material having high thermal conductivity, for example niobium. The inserts are rods or tubes. Discs separate the fuel pellets. Using the BISON fuel performance code it was found that the peak fuel temperature can be lowered by more than 600 degrees C for one set of conditions with niobium metal as the thermal conductor. In addition to improved safety margin, several advantages are expected from the lower temperature such as decreased fission gas release and fuel cracking. Advantages and disadvantages are discussed. An enrichment of only 7.5% fully compensates the lost reactivity of the displaced UO2. Slightly higher enrichments, such as 9%, allow uprates and increased burnups to offset the initial costs for retooling. The design has applications for fast reactors and transuranic burning, which may accelerate its development. A zirconium silicide coating is also described for accident tolerant applications. A self-limiting degradation behavior for this coating is expected to produce a glassy, self-healing layer that becomes more protective at elevated temperature, with some similarities to MoSi2 and other silicides. Both the fuel and coating may benefit from the existing technology infrastructure and the associated wide expertise for a more rapid development in comparison to other, more novel fuels and cladding.

  3. Ultra-high Resolution Optics for EUV and Soft X-ray Inelastic Scattering

    SciTech Connect

    Voronov, Dmitry L.; Cambie, Rossana; Ahn, Minseung; Anderson, Erik H.; Chang, Chih-Hao; Gullikson, Eric M.; Heilmann, Ralf K.; Salmassi, Farhad; Schattenburg, Mark L.; Yashchuk, Valeriy V.; Padmore, Howard A.

    2009-09-16

    We describe a revolutionary new approach to high spectral resolution soft x-ray optics. Conventionally in the soft x-ray energy range, high spectral resolution is obtained by use of a relatively low line density grating operated in 1st order with small slits. This severely limits throughput. This limitation can be removed by use of a grating either in very high order, or with very high line density, if one can maintain high diffraction efficiency. We have developed a new technology for achieving both of these goals which should allow high throughput spectroscopy, at resolving powers of up to 106 at 1 keV. Such optics should provide a revolutionary advance for high resolution lifetime free spectroscopy, such as RIXS, and for pulse compression of chirped beams. We report recent developmental fabrication and characterization of a prototype grating optimized for 14.2 nm EUV light. The prototype grating with a 200 nm period of the blazed grating substrate coated with 20 Mo/Si bilayers with a period of 7.1 nm demonstrates good dispersion in the third order (effective groove density of 15,000 lines per mm) with a diffraction efficiency of more than 33percent.

  4. Re Effects on Phase Stability and Mechanical Properties of MoSS+Mo3Si+Mo5SiB2 alloys

    SciTech Connect

    Yang, Ying; Bei, Hongbin; George, Easo P; Tiley, Jaimie

    2013-01-01

    Because of their high melting points and good oxidation resistance Mo-Si-B alloys are of interest as potential ultrahigh-temperature structural materials. But their major drawbacks are poor ductility and fracture toughness at room temperature. Since alloying with Re has been suggested as a possible solution, we investigate here the effects of Re additions on the microstructure and mechanical properties of a ternary alloy with the composition Mo-12.5Si-8.5B (at.%). This alloy has a three-phase microstructure consisting of Mo solid-solution (MoSS), Mo3Si, and Mo5SiB2 and our results show that up to 8.4 at.% Re can be added to it without changing its microstructure or forming any brittle phase at 1600 C. Three-point bend tests using chevron-notched specimens showed that Re did not improve fracture toughness of the three-phase alloy. Nanoindentation performed on the MoSS phase in the three-phase alloy showed that Re increases Young s modulus, but does not lower hardness as in some Mo solid solution alloys. Based on our thermodynamic calculations and microstructural analyses, the lack of a Re softening effect is attributed to the increased Si levels in the Re-containing MoSS phase since Si is known to increase its hardness. This lack of softening is possibly why there is no Re-induced improvement in fracture toughness.

  5. Short-wavelength ablation of polymers in the high-fluence regime

    NASA Astrophysics Data System (ADS)

    Liberatore, Chiara; Mann, Klaus; Müller, Matthias; Pina, Ladislav; Juha, Libor; Vyšín, Ludek; Rocca, Jorge J.; Endo, Akira; Mocek, Tomas

    2014-05-01

    Short-wavelength ablation of poly(1,4-phenylene ether-ether-sulfone) (PPEES) and poly(methyl methacrylate) (PMMA) was investigated using extreme ultraviolet (XUV) and soft x-ray (SXR) radiation from plasma-based sources. The initial experiment was performed with a 10 Hz desktop capillary-discharge XUV laser lasing at 46.9 nm. The XUV laser beam was focused onto the sample by a spherical mirror coated with a Si/Sc multilayer. The same materials were irradiated with 13.5 nm radiation emitted by plasmas produced by focusing an optical laser beam onto a xenon gas-puff target. A Schwarzschild focusing optics coated with a Mo/Si multilayer was installed at the source to achieve energy densities exceeding 0.1 J cm-2 in the tight focus. The existing experimental system at the Laser Laboratorium Göttingen was upgraded by implementing a 1.2 J driving laser. An increase of the SXR fluence was secured by improving the alignment technique.

  6. Microstructure of RERTR DU-Alloys Irradiated with Krypton Ions

    SciTech Connect

    J. Gan; D. Keiser; D. Wachs; B. Miller; T. Allen; M. Kirk; J. Rest

    2009-11-01

    Fuel development for reduced enrichment research and test reactor (RERTR) program is tasked with the development of new low enrichment uranium fuels that can be employed to replace existing high enrichment uranium fuels currently used in many research and test reactors worldwide. Radiation stability of the interaction product formed at fuel-matrix interface has a strong impact on fuel performance. Three depleted uranium alloys are cast that consist of the following 5 phases of interest to be investigated: U(Si,Al)3, (U,Mo)(Si,Al)3, UMo2Al20, U6Mo4Al43 and UAl4. Irradiation of TEM disc samples with 500 keV Kr ions at 200?C to high doses up to ~100 dpa were conducted using an intermediate voltage electron microscope equipped with an ion accelerator. The irradiated microstructure of the 5 phases is characterized using transmission electron microscopy. The results will be presented and the implication of the observed irradiated microstructure on the fuel performance will be discussed.

  7. X-ray optics for laser-plasma sources: Aplications of intense SXR and EUV radiation pulses

    SciTech Connect

    Bartnik, Andrzej; Fiedorowicz, Henryk; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Anna; Szczurek, Miroslaw; Wachulak, Przemyslaw; Pina, Ladislav

    2012-05-17

    In this work we present a short review of SXR and EUV optics that have been designed and developed for experiments concerning material processing and imaging, using a laser-plasma radiation source based on a gas puff target. Three different kinds of mirrors employed as the EUV collectors are presented: the grazing incidence axisymmetrical ellipsoidal mirror, the grazing incidence multifoil mirror, and the ellipsoidal mirror with Mo/Si multilayer coating. Experiments concerning characterization of the mirrors were performed using EUV radiation from Kr or Xe plasmas produced in a double stream gas puff target irradiated with Nd:YAG laser pulses (4ns, 0.8 J, 10 Hz). Intensity of the focused radiation was sufficient for micromachining of organic polymers and surface modification of organic and inorganic solids. Different kinds of micro-and nanostructures created in near-surface layers of different kinds polymers were obtained. Significant differences were revealed in XPS spectra acquired for irradiated and not irradiated polymers.

  8. In situ observation of thermal expansion of tetragonal C11b phase in Zr2Cu(1-x)Odx alloys

    SciTech Connect

    Xu, Min; Ye, Y. Y.; Morris, James R; Sordelet, D. J.; Kramer, M. J.

    2010-01-01

    The C11b phase crystalline structure (structure type MoSi{sub 2}, space group I4/mmm) in the Zr{sub 2}Cu{sub (1-x)}Pd{sub x} (x = 0, 0.25, 0.5, 0.75 and 1) alloys was examined in situ using high temperature X-ray diffraction (HTXRD) and Rietveld refinement of the data obtained at a constant heating rate. While the cell volume increases with increasing Pd as expected by the larger atomic radii, the coefficients of thermal expansion (CTEs) do not follow a uniform trend. The bonding in the basal plane is more elastically rigid than along the c-axis for all compositions. The CTE is more anisotropic for Zr{sub 2}Pd than for Zr{sub 2}Cu, which is consistent with the first-principles calculations that illustrate the rigidity of c-axis relatively to a-axis to be the less for Zr{sub 2}Pd. The CTE of the a-axis for Zr{sub 2}Pd is in fact negative over the temperature range measured.

  9. Fracture and fatigue properties of Mo-Mo{sub 3}Si-Mo{sub 5}SiB{sub 2} refractory intermetallic alloys at ambient to elevated temperatures (25-1300 degrees Centigrade)

    SciTech Connect

    Choe, Heeman; Schneibel, J.H.; Ritchie, R.O.

    2002-08-01

    The need for structural materials with high-temperature strength and oxidation resistance coupled with adequate lower-temperature toughness for potential use at temperatures above {approx} 1000 degrees C has remained a persistent challenge in materials science. In this work, one promising class of intermetallic alloys is examined, namely boron-containing molybdenum silicides, with compositions in the range Mo (bal), 12-17 at. percentSi, 8.5 at. percentB, processed using both ingot (I/M) and powder (P/M) metallurgy methods. Specifically, the oxidation (''pesting''), fracture toughness and fatigue-crack propagation resistance of four such alloys, which consisted of {approx}21 to 38 vol. percent a-Mo phase in an intermetallic matrix of Mo3Si and Mo5SiB2 (T2), were characterized at temperatures between 25 degrees and 1300 degrees C. The boron additions were found to confer superior ''pest'' resistance (at 400 degrees to 900 degrees C) as compared to unmodified molybdenum silicides, such as Mo5Si3. Moreover , although the fracture and fatigue properties of the finer-scale P/M alloys were only marginally better than those of MoSi2, for the I/M processed microstructures with coarse distributions of the a-Mo phase, fracture toughness properties were far superior, rising from values above 7 MPa sqrt m at ambient temperatures to almost 12 MPa sqrt m at 1300 degrees C.

  10. Shock synthesis of silicides; 2: Thermodynamics and kinetics

    SciTech Connect

    Meyers, M.A.; Lihsing Yu; Vecchio, K.S. . Dept. of Applied Mechanics and Engineering Sciences)

    1994-03-01

    A thermodynamic and kinetic analysis of shock-induced reactions in the (Nb or Mo)-Si systems provides a framework for the extraordinarily high reaction rates and a quantitative interpretation of the experimental results obtained in Part 1. The thermodynamic analysis is conducted by adding the heat of reaction to the shock energy; increases in shock pressure, temperature, and velocity are predicted. At the particle level, melting at the silicon-metal interface is found to be a necessary condition for the initiation of reaction; heat conduction calculations enable the prediction of a critical molten (Si) region size for which the heat generated through the reaction exceeds the heat lost to the unreacted regions. The calculation of melt fraction (of Si) as a function of shock energy for the initiation of shock-induced reaction. At the local level, the reaction kinetics can be rationalized through the production of a liquid-phase reaction product (NbSi[sub 2]), the formation of spherical nodules of this product through interfacial tension to melt niobium along the interface which facilitates both the expulsion of the NbSi[sub 2] nodules into the liquid Si, and the generation of fresh Nb interface for further reaction. In addition, the dissolved Nb enriches the surrounding Si liquid, promoting more NbSi[sub 2] reaction and formation.

  11. Evaluation of KLA-Tencor LMS IPRO5 beta system for 22nm node registration and overlay applications

    NASA Astrophysics Data System (ADS)

    Ferber, M.; Laske, F.; Röth, K.-D.; Adam, D.

    2011-11-01

    Using various technical tricks, 193nm lithography has been pushed for the 22nm logic node. For optical and EUV lithography, the International Technology Roadmap for Semiconductors (ITRS [1]) requests a registration error below 3.8 nm for masks for single-patterning layers. Double patterning further reduces the tolerable pattern placement error to < 2.7 nm for each mask of a pair that forms one layer on the wafer. For mask metrology on the 2x node, maintaining a precision-to-tolerance (P/T) ratio of 0.25 will be challenging. The total measurement uncertainty has to be significantly below 1.0nm. In this work, results obtained during the LMS IPRO5 beta system evaluation are presented. LMS IPRO5 beta system evaluation is part of the CDUR32 project, funded by the German Federal Ministry of Education and Research. A major improvement to previous LMS IPRO generations is the new laser illumination system, which significantly improves optical resolution and contrast (especially on EUV substrates). Therefore, optical resolution and measurement capability are evaluated using standard registration targets, in-die wafer overlay targets, and arbitrary shaped features on different substrates comprising EUV and binary MoSi masks. Position measurement uncertainty for the new center of gravity (CofG) measurement algorithm, important for in-die measurement capability, is evaluated. The results are compared with results obtained using the traditional edge detection algorithm.

  12. An XPS study of the adherence of refractory carbide, silicide, and boride RF-sputtered wear-resistant coatings. [X-ray Photoelectron Spectroscopy of steel surfaces

    NASA Technical Reports Server (NTRS)

    Brainard, W. A.; Wheeler, D. R.

    1978-01-01

    Radio frequency sputtering was used to deposit refractory carbide, silicide, and boride coatings on 440-C steel substrates. Both sputter etched and pre-oxidized substrates were used and the films were deposited with and without a substrate bias. The composition of the coatings was determined as a function of depth by X-ray photoelectron spectroscopy combined with argon ion etching. Friction and wear tests were conducted to evaluate coating adherence. In the interfacial region there was evidence that bias may produce a graded interface for some compounds. Biasing, while generally improving bulk film stoichiometry, can adversely affect adherence by removing interfacial oxide layers. Oxides of all film constituents except carbon and iron were present in all cases but the iron oxide coverage was only complete on the preoxidized substrates. The film and iron oxides were mixed in the MoSi2 and Mo2C films but layered in the Mo2B5 films. In the case of mixed oxides, preoxidation enhanced film adherence. In the layered case it did not.

  13. Temperature dependencies of hydrogen-induced blistering of thin film multilayers

    SciTech Connect

    Kuznetsov, A. S.; Gleeson, M. A.; Bijkerk, F.

    2014-05-07

    We report on the influence of sample temperature on the development of hydrogen-induced blisters in Mo/Si thin-film multilayers. In general, the areal number density of blisters decreases with increasing exposure temperature, whereas individual blister size increases with exposure temperatures up to ∼200 °C but decreases thereafter. Comparison as a function of sample temperature is made between exposures to a flux containing both hydrogen ions and neutrals and one containing only neutrals. In the case of the neutral-only flux, blistering is observed for exposure temperatures ≥90 °C. The inclusion of ions promotes blister formation at <90 °C, while retarding their growth at higher temperatures. In general, ion-induced effects become less evident with increasing exposure temperature. At 200 °C, the main effect discernable is reduced blister size as compared with the equivalent neutral-only exposure. The temperature during exposure is a much stronger determinant of the blistering outcome than either pre- or post-annealing of the sample. The trends observed for neutral-only exposures are attributed to competing effects of defect density thermal equilibration and H-atom induced modification of the Si layers. Energetic ions modify the blistering via (temperature dependent) enhancement of H-mobility and re-crystallization of amorphous Si.

  14. Magnetic Dynabeads detection by sensitive element based on giant magnetoimpedance.

    PubMed

    Kurlyandskaya, Galina; Levit, Vladimir

    2005-02-15

    A GMI-biosensor prototype was designed and fabricated using an amorphous ribbon. As a first step, a GMI response was measured with a model liquid media: suspension containing magnetisable Dynabeads M-450. These beads can be used as biomolecular labels when coated with a specific antibody. The GMI change caused by their presence was measured with a biosensor prototype designed with a measuring cell containing an amorphous CoFeMoSiB-ribbon element. GMI was measured at a range of current frequencies from 0.3 to 10 MHz and at intensities of either Irms=3 or 4.5 mA. Commercial Dynabeads M-450 were supplied as a suspension in a phosphate buffered saline. A maximum difference of 25% in the GMI ratio measured with and without Dynabeads was obtained at a frequency of 3.5 MHz and Irms=3 mA. Some potential applications for GMI-biosensor and further directions are proposed. PMID:15626616

  15. Structural and electronic properties of XSi{sub 2} (X = Cr, Mo, and W)

    SciTech Connect

    Shugani, Mani; Aynyas, Mahendra; Sanyal, S. P.

    2015-07-15

    The structural and electronic properties of metal silicides XSi{sub 2} (X = Cr, Mo, and W), which crystallize in tetragonal structure, are investigated systematically using the first-principle density functional theory. The total energies are computed as a function of volume and fitted to the Birch equation of state. The ground-state properties such as equilibrium lattice constants a{sub 0} and c{sub 0}, bulk modulus B, its pressure derivative B, B′, and the density of states at the Fermi level, N(E{sub F}), are calculated and compared with other experimental and theoretical results, showing good agreement. The calculated band structure indicates that XSi{sub 2} compounds are semimetallic in nature. From the present study, we predict the structural and electronic properties of CrSi{sub 2} in the tetragonal phase and indicate that CrSi{sub 2} is energetically more stable than MoSi{sub 2} and WSi{sub 2}. Analyzing the bonding properties of the three metal silicides, we observe that WSi{sub 2} has a strong covalent bonding due to W 5d electrons.

  16. Nitridation and CVD reactions with hydrazine

    SciTech Connect

    Vogt, K.W.; Kohl, P.A.; Abys, J.A.

    1995-10-01

    The low-temperature nitridation of gallium arsenide, silicon and transition metals was investigated using hydrazine. Gallium nitride films were grown on gallium arsenide (GaAs) by direct reaction of the semiconductor surface layers with hydrazine at 200--400 C. Auger electron spectroscopy and X-ray photoelectron spectroscopy (XPS) analyses show that the films are primarily gallium nitride with a small oxide impurity. Thin nitride films ({approximately}15{angstrom}) were grown on silicon by reaction with hydrazine at 300--500 C. Ellipsometry results suggest that the film growth goes through different phases following linear, parabolic and logarithmic functions with time. XPS analysis shows that the nitride films could be formed at much lower temperatures than possible with ammonia (300 vs. 600 C). The formation of numerous transition metal nitrides (Co, Cr, Fe, Mo, Si, Ta, Ti, V, and W) by reaction with hydrazine at 400 C is demonstrated, as well as the chemical vapor deposition of boron nitride films from diborane and hydrazine reactants. The temperature at the mixing point was critical in determining the final composition of the film. A 1-D transport model suggests that the reaction rate at 400 C was kinetically limited. The results also agree qualitatively with thermodynamic equilibrium calculations.

  17. Magnetic properties and structure of nanocrystalline FINEMET alloys with various iron contents

    NASA Astrophysics Data System (ADS)

    Mushnikov, N. V.; Potapov, A. P.; Shishkin, D. A.; Protasov, A. V.; Golovnya, O. A.; Shchegoleva, N. N.; Gaviko, V. S.; Shunyaev, K. Yu.; Bykov, V. A.; Starodubtsev, Yu. N.; Belozerov, V. Ya.

    2015-07-01

    The effect of the composition and annealing temperature on the structure and magnetic properties of soft magnetic nanocrystalline Fe-Cu-Nb-Mo-Si-B alloys has been studied. An increase in the iron content compared to that in the traditional FINEMET alloy is shown to allow one to increase the magnetic induction by 18% at a coercive force of no less than 6 A/m. It has been found that, along with the amorphous phase, rapidly quenched ribbons of alloys enriched in Fe contain crystalline α-Fe-based phase precipitates, the (100) crystallographic directions of which are perpendicular to the ribbon plane. Thermomagnetic analysis and differential scanning calorimetry were used to determine the temperatures of structural and magnetic phase transformations of the alloys with different iron contents. It was found that the separation of amorphous phase into areas of different compositions precedes the precipitation of nano-sized soft magnetic Fe-Si phase grains in the rapidly quenched iron-enriched ribbons.

  18. Development of a reflectometer for a large EUV mirror in NewSUBARU

    NASA Astrophysics Data System (ADS)

    Iguchi, Haruki; Hashimoto, Hiraku; Kuki, Masaki; Harada, Tetsuo; Watanabe, Takeo; Kinoshita, Hiroo

    2015-07-01

    In extreme-ultraviolet (EUV) lithography, mirror optics is coated with a Mo/Si multilayer film. Since throughput of an EUV system is directly depends on the multilayer film reflectance, we have developed a mask reflectometer to evaluate the reflectance in BL-10 beamline of the NewSUBARU synchrotron facility. In particular, the EUV output power from a EUV light source relates to the reflectance of a collector mirror. Thus, we installed a new large reflectometer in BL-10 beamline to evaluate the collector mirror reflectance. The reflectometer can measure a mirror with a diameter of up to 800 mm, a thickness of 250 mm, and a weight of 50 kg. The entire sample surface can be measured in spherical coordinate using vertical γ and rotation Φ axis. Each axis positions are measured with optical encoders precisely, and are controlled in closed-loop operation. We measured reflectance of an EUV mask using the large reflectometer and the mask reflectometer. The peak reflectance was well consisted with the two reflectometer within 0.1%. The large reflectometer has high reproducibility of the peak reflectance measurement.

  19. Carbon film growth on model MLM cap layer: interaction of selected hydrocarbon vapor with Ru(10-10) surface

    NASA Astrophysics Data System (ADS)

    Yakshinskiy, B. V.; Bartynski, R. A.

    2010-04-01

    The aim of this work is to explore the thermal and non-thermal interaction of toluene, benzene and isobutene vapor with a crystalline Ru(10-10) surface, a model surface for Ru capping layers used in EUV lithography. Our main objective is to provide insights into the basic processes that affect the reflectivity of Ru-coated Mo/Si multilayer mirrors that are exposed to EUV radiation. A low energy electron beam is employed to mimic excitations initiated by EUV radiation. Temperature programmed desorption (TPD), x-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), and electron-stimulated desorption (ESD) are used to analyze the surface reactions. Pyrolysis of a chemisorbed hydrocarbon layer on the Ru surface leads to the dehydrogenation and buildup a self-limited carbon monolayer. Carbon film growth on the Ru(10-10) crystalline surface under 100 eV electron bombardment in hydrocarbon vapor is measured over a range of pressures and temperatures near 300 K. The carbon growth rate is ~10 times higher in the presence of toluene vapor than in the presence of benzene or isobutene vapor. The estimations of the adsorption energy, the steadystate coverage of the molecules on the surface and the cross-sections for electron-stimulated dissociation are presented. A graphene-like carbon layer is probed as possible way to reduce the surface contamination rate.

  20. Dry etching technologies for the advanced binary film

    NASA Astrophysics Data System (ADS)

    Iino, Yoshinori; Karyu, Makoto; Ita, Hirotsugu; Yoshimori, Tomoaki; Azumano, Hidehito; Muto, Makoto; Nonaka, Mikio

    2011-11-01

    ABF (Advanced Binary Film) developed by Hoya as a photomask for 32 (nm) and larger specifications provides excellent resistance to both mask cleaning and 193 (nm) excimer laser and thereby helps extend the lifetime of the mask itself compared to conventional photomasks and consequently reduces the semiconductor manufacturing cost [1,2,3]. Because ABF uses Ta-based films, which are different from Cr film or MoSi films commonly used for photomask, a new process is required for its etching technology. A patterning technology for ABF was established to perform the dry etching process for Ta-based films by using the knowledge gained from absorption layer etching for EUV mask that required the same Ta-film etching process [4]. Using the mask etching system ARES, which is manufactured by Shibaura Mechatronics, and its optimized etching process, a favorable CD (Critical Dimension) uniformity, a CD linearity and other etching characteristics were obtained in ABF patterning. Those results are reported here.

  1. Effect of roughness, deterministic and random errors in film thickness on the reflecting properties of aperiodic mirrors for the EUV range

    NASA Astrophysics Data System (ADS)

    Gaikovich, P. K.; Polkovnikov, V. N.; Salashchenko, N. N.; Chkhalo, N. I.; Schäfers, F.; Sokolov, A.

    2016-05-01

    By the example of three aperiodic multilayer Mo/Si mirrors (AMM) for the wavelength ranges 17–21 nm, 24–29 nm, and 28–33 nm we have studied numerically the effect of the linearly determinisctic and random fluctuations of the film thickness and the interlayer roughness on the spectral dependences of the reflection coefficient. The simulation results are used to solve the inverse problem of reconstructing the interlayer roughness and the thickness of individual films from the measured dependences of the extreme UV radiation reflection coefficients. It is shown that the 'asymmetry' of the boundaries affects the magnitude and slope of the reflection coefficient plateau. Random fluctuations of the film thickness with the variance of 1%–2% weakly influence the reflection characteristics of AMMs and allow reliable reconstruction of the thickness of individual films. The fluctuations with the variance 8%–10% allow the estimation of individual thicknesses, but the reflection curve in this case strongly differs from the desirable one. Larger fluctuations do not allow the reconstruction of the AMM structure. The basic criteria for high-quality AMM synthesis are formulated.

  2. Growth and Printability of Multilayer Phase Defects on EUV MaskBlanks

    SciTech Connect

    Liang, Ted; Ultanir, Erdem; Zhnag, Guojing; Park, Seh-Jin; Anderson, Erik; Gullikson, Eric; Naulleau, Patrick; Salmassi, Farhad; Mirkarimi, Paul; Spiller, Eberhard; Baker, Sherry

    2007-06-10

    The ability to fabricate defect-free mask blanks is a well-recognized challenge in enabling extreme ultraviolet lithography (EUVL) for semiconductor manufacturing. Both the specification and reduction of defects necessitate the understanding of their printability and how they are generated and grow during Mo-Si multilayer (ML) deposition. A ML phase defect can be depicted by its topographical profile on the surface as either a bump or pit, which is then characterized by height or depth and width. The complexity of such seemingly simple phase defects lies in the many ways they can be generated and the difficulties of measuring their physical shape/size and optical effects on printability. An effective way to study phase defects is to use a programmed defect mask (PDM) as 'model' test sample where the defects are produced with controlled growth on a ML blank and accurate placement in varying proximity to absorber patterns on the mask. This paper describes our recent study of ML phase defect printability with resist data from exposures of a ML PDM on the EUV micro-exposure tool (MET, 5X reduction with 0.3NA).

  3. EUVL printing results of a low-thermal expansion material (LTEM) mask

    NASA Astrophysics Data System (ADS)

    Tong, William M.; Taylor, John S.; Hector, Scott D.; Shell, Melissa K.; Zhang, Guojing; Kearney, Patrick A.; Walton, Christopher C.; Larson, Cindy C.; Wasson, James R.; Mangat, Pawitter J. S.; O'Connell, Donna J.; Folk, Daniel R.

    2000-07-01

    Minimizing image placement errors due to thermal distortion of the mask is a key requirement for qualifying EUV Lithography as a Next Generation Lithography (NGL). Employing Low Thermal Expansion Materials (LTEMs) for mask substrates is a viable solution for controlling mask thermal distortion and is being investigated by a wide array of researchers, tool makers, photomask suppliers, and material manufacturers. Finite element modeling has shown that an EUVL mask with a Coefficient of Thermal Expansion (CTE) of less than 20 ppb/K will meet overlay error budgets for Mo/Si multilayers, patterned, and printed using the 10X Microstepper. The images were essentially indistinguishable from those images acquired from masks fabricated from high quality silicon wafers as substrates. Our observations lend further evidence that an LTEM can be used as the EUVL mask substrate material.

  4. EUV imaging experiment of an adaptive optics telescope

    NASA Astrophysics Data System (ADS)

    Kitamoto, S.; Shibata, T.; Takenaka, E.; Yoshida, M.; Murakami, H.; Shishido, Y.; Gotoh, N.; Nagasaki, K.; Takei, D.; Morii, M.

    2009-08-01

    We report an experimental result of our normal-incident EUV telescope tuned to a 13.5 nm band, with an adaptive optics. The optics consists of a spherical primary mirror and a secondary mirror. Both are coated by Mo/Si multilayer. The diameter of the primary and the secondary mirrors are 80 mm and 55mm, respectively. The secondary mirror is a deformable mirror with 31 bimorph-piezo electrodes. The EUV from a laser plasma source was exposed to a Ni mesh with 31 micro-m wires. The image of this mesh was obtained by a backilluminated CCD. The reference wave was made by an optical laser source with 1 μm pin-hole. We measure the wave form of this reference wave and control the secondary mirror to get a good EUV image. Since the paths of EUV and the optical light for the reference were different from each other, we modify the target wave from to control the deformable mirror, as the EUV image is best. The higher order Zernike components of the target wave form, as well as the tilts and focus components, were added to the reference wave form made by simply calculated. We confirmed the validity of this control and performed a 2.1 arc-sec resolution.

  5. Crystallographic study of Si and ZrN coated U-Mo atomised particles and of their interaction with al under thermal annealing

    NASA Astrophysics Data System (ADS)

    Zweifel, T.; Palancher, H.; Leenaers, A.; Bonnin, A.; Honkimaki, V.; Tucoulou, R.; Van Den Berghe, S.; Jungwirth, R.; Charollais, F.; Petry, W.

    2013-11-01

    A new type of high density fuel is needed for the conversion of research and test reactors from high to lower enriched uranium. The most promising one is a dispersion of atomized uranium-molybdenum (U-Mo) particles in an Al matrix. However, during in-pile irradiation the growth of an interaction layer between the U-Mo and the Al matrix strongly limits the fuel's performance. To improve the in-pile behaviour, the U-Mo particles can be coated with protective layers. The SELENIUM (Surface Engineering of Low ENrIched Uranium-Molybdenum) fuel development project consists of the production, irradiation and post-irradiation examination of 2 flat, full-size dispersion fuel plates containing respectively Si and ZrN coated U-Mo atomized powder dispersed in a pure Al matrix. In this paper X-ray diffraction analyses of the Si and ZrN layers after deposition, fuel plate manufacturing and thermal annealing are reported. It was found for the U-Mo particles coated with ZrN (thickness 1 μm), that the layer is crystalline, and exhibits lower density than the theoretical one. Fuel plate manufacturing does not strongly influence these crystallographic features. For the U-Mo particles coated with Si (thickness 0.6 μm), the measurements of the as received material suggest an amorphous state of the deposited layer. Fuel plate manufacturing strongly modifies its composition: Si reacts with the U-Mo particles and the Al matrix to grow U(Al, Si)3 and U3Si5 phases. Finally both coatings have shown excellent performances under thermal treatment by limiting drastically the U-Mo/Al interdiffusion. U(Al,Si)3 with two lattice parameters (4.16 Å and 4.21 Å), A distorted U3Si5 phase. Note that these phases were not present in the U-Mo(Si) powders. These phases are usually found in the Silicon rich diffusion layer (SiRDL) obtained in dispersed fuels (as-manufactured U-Mo/Al(Si) fuel plates [12,3] or annealed UMo(Si)/Al fuel rods [40]) as well as in diffusion couples (U-Mo/Al(Si7) [37-39] or U-Mo/Si

  6. Quantum confinement in semiconductor nanofilms: Optical spectra and multiple exciton generation

    NASA Astrophysics Data System (ADS)

    Khmelinskii, Igor; Makarov, Vladimir I.

    2016-04-01

    We report optical absorption and photoluminescence (PL) spectra of Si and SnO2 nanocrystalline films in the UV-vis-NIR range, featuring discrete bands resulting from transverse quantum confinement, observed in the optical spectra of nanofilms for the first time ever. The film thickness ranged from 3.9 to 12.2 nm, depending on the material. The results are interpreted within the particle-in-a-box model, with infinite walls. The calculated values of the effective electron mass are independent on the film thickness and equal to 0.17mo (Si) and 0.21mo (SnO2), with mo the mass of the free electron. The second calculated model parameter, the quantum number n of the HOMO (valence band), was also thickness-independent: 8.00 (Si) and 7.00 (SnO2). The transitions observed in absorption all start at the level n and correspond to Δn = 1, 2, 3, …. The photoluminescence bands exhibit large Stokes shifts, shifting to higher energies with increased excitation energy. In effect, nanolayers of Si, an indirect-gap semiconductor, behave as a direct-gap semiconductor, as regards the transverse-quantized level system. A prototype Si-SnO2 nanofilm photovoltaic cell demonstrated photoelectron quantum yields achieving 2.5, showing clear evidence of multiple exciton generation, for the first time ever in a working nanofilm device.

  7. Boron modified molybdenum silicide and products

    DOEpatents

    Meyer, M.K.; Akinc, M.

    1999-02-02

    A boron-modified molybdenum silicide material is disclosed having the composition comprising about 80 to about 90 weight % Mo, about 10 to about 20 weight % Si, and about 0.1 to about 2 weight % B and a multiphase microstructure including Mo{sub 5}Si{sub 3} phase as at least one microstructural component effective to impart good high temperature creep resistance. The boron-modified molybdenum silicide material is fabricated into such products as electrical components, such as resistors and interconnects, that exhibit oxidation resistance to withstand high temperatures in service in air as a result of electrical power dissipation, electrical resistance heating elements that can withstand high temperatures in service in air and other oxygen-bearing atmospheres and can span greater distances than MoSi{sub 2} heating elements due to improved creep resistance, and high temperature structural members and other fabricated components that can withstand high temperatures in service in air or other oxygen-bearing atmospheres while retaining creep resistance associated with Mo{sub 5}Si{sub 3} for structural integrity. 7 figs.

  8. Boron modified molybdenum silicide and products

    DOEpatents

    Meyer, Mitchell K.; Akinc, Mufit

    1999-02-02

    A boron-modified molybdenum silicide material having the composition comprising about 80 to about 90 weight % Mo, about 10 to about 20 weight % Si, and about 0.1 to about 2 weight % B and a multiphase microstructure including Mo.sub.5 Si.sub.3 phase as at least one microstructural component effective to impart good high temperature creep resistance. The boron-modified molybdenum silicide material is fabricated into such products as electrical components, such as resistors and interconnects, that exhibit oxidation resistance to withstand high temperatures in service in air as a result of electrical power dissipation, electrical resistance heating elements that can withstand high temperatures in service in air and other oxygen-bearing atmospheres and can span greater distances than MoSi.sub.2 heating elements due to improved creep resistance, and high temperature structural members and other fabricated components that can withstand high temperatures in service in air or other oxygen-bearing atmospheres while retaining creep resistance associated with Mo.sub.5 Si.sub.3 for structural integrity.

  9. Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool

    NASA Astrophysics Data System (ADS)

    Edinger, Klaus; Boegli, Volker; Degel, Wolfgang

    2005-06-01

    With the ever decreasing feature sizes and increasing cost of current and future photolithographic masks the repair of these masks becomes a substantial factor of the total mask production cost. In a collaborative effort NaWoTec, Carl Zeiss Nano Technology Systems Division (NTS) and Carl Zeiss Semiconductor Metrology Systems Division (SMS) have built an electron beam based mask repair tool capable of processing a wide variety of mask types, such as quartz binary masks, phase shift masks, EUV masks, and e-beam projection stencil masks. In this paper, besides a brief overview of the tool platform, we will present the automated repair of clear and opaque defects on Cr and MoSi quartz masks. Emphasis will be put onto the resolution and the speed of the repair procedure and the high grade of automation and integration achievable in the repair of high-end photomasks. An outlook against the ITRS requirements and the extendibility of the presented solution to further technology nodes will be given in the summary.

  10. Role of matrix/reinforcement interfaces in the fracture toughness of brittle materials toughened by ductile reinforcements

    NASA Astrophysics Data System (ADS)

    Xiao, L.; Abbaschian, R.

    1992-10-01

    Crack interactions with ductile reinforcements, especially behavior of a crack tip at the interface, have been studied using MoSi2 composites reinforced with Nb foils. Effects of fracture energy of interfaces on toughness of the composites have also been investigated. Variation of interfacial bonding was achieved by depositing an oxide coating or by the development of a reaction prod- uct layer between the reinforcement and matrix. Toughness was measured using bend tests on chevron-notched specimens. It has been established that as a crack interacts with a ductile re- inforcement, three mechanisms compcte: interfacial debonding, multiple matrix fracture, and direct crack propagation through the reinforcement. Decohesion length at the matrix/reinforcement interface depends on the predominant mechanism. Furthermore, the results add to the evidence that the extent to which interfacial bonding is conducive to toughness of the composites depends on the criterion used to describe the toughness and that ductility of the ductile reinforcement is also an important factor in controlling toughness of the composites. Loss of ductility of the ductile reinforcement due to inappropriate processing could result in little improvement in tough- ness of the composites.

  11. Dissolution de phases minérales MSiO3 ( M Cu, Co, Ni, Zn, Mg) imparfaitement cristallisées au contact de solutions d'agents complexants organiques (porphyrines, amino-acides, asphaltènes)

    NASA Astrophysics Data System (ADS)

    Bergaya, F.; Perruchot, A.; Van Damme, H.

    1983-05-01

    The kinetic and thermodynamic aspects of the dissolution of ill-organized ("gels") high surface area silicates of general formula MO- SiO2- nH2O( M = Cu, Co, Ni, Zn, Mg) in the presence of the following organic compounds have been investigated: meso-tetraphenylporphyrin (H 2TPP, water insoluble), mesotetra(N-methylpyridyl)porphyrin (H 3TMPyP, water soluble), glycine, and asphaltenes. Kinetic aspects were emphasised in the case of H 2TMPyP. The initial rate of the gross dissolution complexation process followed almost quantitatively (passing from one metal to another) the complexation rate of M2+ ions by H 2TMPyP in a purely homogeneous medium, suggesting that the rate limiting step of the overall process is not related to the chemical or physical processes occurring in the solid particles or at the solid-solution interface, but is simply the complexation, in the solution, of the M2+ ions released by the gel particles. Thermodynamic aspects were emphasised in the case of glycine. The total amount of metal which is extracted at equilibrium can be reasonably well predicted from a simple model which takes into account (i) the stability constant of the metal-glycine complex. (ii) the "solubility product" of the gel particles in water. The results obtained with asphaltones are closer to those obtained with glycine than to those obtained with porphyrins, suggesting that porphyrins represent only a minor population in the complexing functional groups of asphaltenes.

  12. Processing and properties of molybdenum silicide intermetallics containing boron

    SciTech Connect

    Schneibel, J.H.; Liu, C.T.; Heatherly, L. Jr.; Carmichael, C.A.

    1998-11-01

    The processing and mechanical properties of Mo-Si-B intermetallic alloys with compositions Mo-26.7Si-7.3B and Mo-12Si-8.5B (at.%) were investigated. The first alloy consisted of the phases Mo{sub 3}Si, Mo{sub 5}Si{sub 3} (T1) and Mo{sub 5}SiB{sub 2} (T2). Attempts to extrude castings of this alloy at 1700 or 1800 C were not successful. Hot isostatic pressing of elemental powders was more promising and room temperature flexure strengths on the order of 200 MPa were reached. The second alloy with the composition Mo-12Si-8.5B could be readily cast and consisted of {alpha}-Mo inclusion in a brittle matrix of Mo{sub 3}Si and T2. A heat treatment of 1 day at 1600C in vacuum improved the room temperature strength and fracture toughness. Values on the order of 500 MPa and 10 MPa m{sup 1/2}, respectively, were obtained. Consistent with ductile phase toughening, limited plastic deformation as well as debonding of the {alpha}-Mo inclusions were seen on fracture surfaces.

  13. Tailoring (n,m) structure of single-walled carbon nanotubes by modifying reaction conditions and the nature of the support of CoMo catalysts.

    PubMed

    Lolli, Giulio; Zhang, Liang; Balzano, Leandro; Sakulchaicharoen, Nataphan; Tan, Yongqiang; Resasco, Daniel E

    2006-02-01

    The (n,m) population distribution of single-walled carbon nanotubes obtained on supported CoMo catalysts has been determined by photoluminescence and optical absorption. It has been found that the (n,m) distribution can be controlled by varying the gaseous feed composition, the reaction temperature, and the type of catalyst support used. When using CO as a feed over CoMo/SiO2 catalysts, increasing the synthesis temperature results in an increase in nanotube diameter, without a change in the chiral angle. By contrast, by changing the support from SiO2 to MgO, nanotubes with similar diameter but different chiral angles are obtained. Finally, keeping the same reaction conditions but varying the composition of the gaseous feed results in different (n,m) distribution. The clearly different distributions obtained when varying catalysts support and/or reaction conditions demonstrate that the (n,m) distribution is a result of differences in the growth kinetics, which in turn depends on the nanotube cap-metal cluster interaction. PMID:16471791

  14. EUV off-axis focusing using a high harmonic source

    NASA Astrophysics Data System (ADS)

    Mills, B.; Rogers, E. T. F.; Grant-Jacob, J.; Stebbings, S. L.; Praeger, M.; de Paula, A. M.; Froud, C. A.; Chapman, R. T.; Butcher, T. J.; Brocklesby, W. S.; Frey, J. G.

    2009-05-01

    High Harmonic Generation is a well established technique for generating Extreme Ultraviolet radiation. It is a promising technique for both structure and spectroscopic imaging due to both the high flux and coherence of the source, and the existence of multiple absorption edges at the generated wavelengths. To increase the flux, a focussing device can be used. Here we present focussing results for a Mo/Si spherical mirror that has been used in an off-axis arrangement, and give extensive analysis of the resulting astigmatic focus and its consequence on diffractive imaging. The astigmatic beam exists as a vertical and horizontal focus, separated by a circle of least confusion. With the help of a theoretical model we show that the most intense part of the beam is always the second line foci and that the phase at the focus is strongly saddle-shaped. However, this phase distortion cannot explain the significant interference peak splitting that is experimentally observed in our diffraction patterns. Instead we propose that the beam quality is degraded upon reflection from the multilayer mirror and it is this asymmetric phase distortion that causes the diffraction peak splitting.

  15. Multilayer reflective coatings for extreme-ultraviolet lithography

    SciTech Connect

    Montcalm, C., LLNL

    1998-03-10

    Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system.

  16. Microstructure and Properties of HVOF-Sprayed Ni-50Cr Coatings

    SciTech Connect

    Joel A. Simpson; Terry C. Totemeier; Richard N. Wright

    2006-06-01

    Thermal spray coatings represent a potential cost-effective means of protecting structural components in advanced fossil energy systems. Previous work at the INL has focused on relationships between thermal spray processing conditions, structure, and properties in alumina- and silica-forming coatings, namely Fe3Al, FeAl, and Mo-Si-B alloys. This paper describes the preparation and characterization of chromia-forming Ni-50%Cr coatings, an alloy similar to the INCOCLAD 671 cladding, which has shown excellent performance in the Niles Plant service tests. The structure and properties of Ni-50Cr coatings are similar to other HVOF-sprayed metallic coatings: a typical lamellar microstructure is observed with essentially no porosity and little oxide. The microhardness and compressive residual stress both increase with increased spray particle velocity. Corrosion tests were performed on a variety of free-standing coatings (removed from the substrate, wrought Fe3Al alloy, and Grade 91 steel in a simulated coal combustion gas (N2-10%CO-5%CO2-2%H2O-0.12%H2S) and gas-slag environments (same gas, with iron sulfide powder in contact with the coating surface). The coatings tested included Fe3Al, FeAl, and Ni-50Cr alloys sprayed at different velocities. In these tests the iron aluminides in wrought and coating form showed the best performance, with Ni-50Cr coatings slightly worse; the Grade 91 steel was severely attacked.

  17. Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) for application in science and technology

    NASA Astrophysics Data System (ADS)

    Bartnik, Andrzej; Wachulak, Przemysław; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Mirosław; Adjei, Daniel; Ahad, Inam Ul; Ayele, Mesfin G.; Fok, Tomasz; Szczurek, Anna; Torrisi, Alfio; Wegrzyński, Łukasz; Fiedorowicz, Henryk

    2015-05-01

    Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) developed in our laboratory for application in various areas of technology and science are presented. The sources are based on a laser-irradiated gas puff target approach. The targets formed by pulsed injection of gas under high-pressure are irradiated with nanosecond laser pulses from Nd:YAG lasers. We use commercial lasers generating pulses with time duration from 1ns to 10ns and energies from 0.5J to 10J at 10Hz repetition rate. The gas puff targets are produced using a double valve system equipped with a special nozzle to form a double-stream gas puff target which secures high conversion efficiency without degradation of the nozzle. The use of a gas puff target instead of a solid target makes generation of laser plasmas emitting soft x-rays and EUV possible without target debris production. The sources are equipped with various optical systems, including grazing incidence axisymmetric ellipsoidal mirrors, a "lobster eye" type grazing incidence multi-foil mirror, and an ellipsoidal mirror with Mo/Si multilayer coating, to collect soft x-ray and EUV radiation and form the radiation beams. In this paper new applications of these sources in various fields, including soft x-ray and EUV imaging in nanoscale, EUV radiography and tomography, EUV materials processing and modification of polymer surfaces, EUV photoionization of gases, radiobiology and soft x-ray contact microscopy are reviewed.

  18. Investigation of scum type growing defects on attenuated PSM and its prevention

    NASA Astrophysics Data System (ADS)

    Choi, Jihwan; Kim, Yongho; Lee, Dongwook; Jung, Hoyong; Kim, Snagpyo; Yim, Donggyu

    2015-10-01

    The abnormal growing defect (we called this defect 'scum haze defect') in the photomask which is generated during the wafer lithography process is very important issue on semiconductor industry. Because wafer yield loss could be caused by the mask CD variation and the transmittance loss due to the growing defects on the photomask, many studies have been done about the mechanism and the solution of the general type growing defects such as haze and Cr migration so far, However we still need to clarify some abnormal types of the growing defects such as scum haze defect. In this paper, we investigated the generation mechanism and prevention techniques of the scum haze defect on the attenuated phase shift mask. This defect composed of CrOx is caused by the increase of the accumulated exposure energy on photomask. This phenomenon is remarkably similar to the Cr migration on binary mask. But, the apparent difference is that this scum type defect is observed on the attenuated phase shift mask which mainly consists of MoSiON film, and it is difficult to control this defect because of its irregular generation characteristic. Additionally, this defect is not generally removed through the conventional wet cleaning process but it only could be removed by a kind of plasma treatment. In this study, the difference of generation mechanism between the scum haze defect and the general haze was discussed, and the optimal process for controlling scum haze defect in the mask manufacturing was described.

  19. DIET Processes on Ruthenium Surfaces Related to Extreme Ultraviolet Lithography (EUVL)

    SciTech Connect

    Yakshinskiy, B.; Wasielewski, R; Loginova, E; Hedhili, M; Madey, T

    2008-01-01

    The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions (high vacuum, and 13.5 nm (92 eV) photons). Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H{sub 2}O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is 6 x 10{sup -19} cm{sup 2}. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is 0.02 electrons/photon at 92 eV.

  20. Erosive wear of selected materials for fossil energy applications

    SciTech Connect

    Adler, Thomas A.; Rawers, James C.; Tylczak, Joseph H.; Hawk, Jeffrey A.

    2001-01-01

    A number of materials have been evaluated to determine their erosion resistance for fossil energy applications. This is part of a larger program to study wear and corrosion at Albany Research Center. This paper will present the results for some of these materials, including FeAl, FeAl cermets, WC-Co cemented carbides, Si3N4-MoSi2, Si3N4, Stellite 6B, white cast irons and 440C steel. Trends in erosion rates due to material properties and erosive conditions will be presented. FeAl cermets performed well compared to the WC-Co cemented carbides. The interparticle spacing of the WC-Co cemented carbides correlated with the erosion rate. The erosion rate of the WC-Co cemented carbides decreased as the interparticle spacing decreased. It is important to realize that erosion resistance is not an intrinsic material property, but is a system response. A change in the wear environment can significantly alter the relative rankings of materials with respect to their wear rate. For example, at relatively low velocities, the carbides in the white cast irons are more erosion resistant than the matrix, while at higher velocities the matrix is more erosion resistant.

  1. High-temperature corrosion of UNS N10003 in molten Li2BeF4 (FLiBe) salt

    DOE PAGESBeta

    Zheng, Guiqiu; Kelleher, Brian; He, Lingfeng; Cao, Guoping; Anderson, Mark; Allen, Todd; Sridharan, Kumar

    2015-07-30

    Here, corrosion testing of Hastelloy N in molten fluoride salt was performed in purified molten 27LiF-BeF2 (66-34mol%) (FLiBe) salt at 700°C for 1000 hours, in pure nickel and graphite capsules. In the nickel capsule tests, the near-surface region of the alloy exhibited an about 200 nm porous structure, an approximately 3.5 μm chromium depleted region, and MoSi2 precipitates. In tests performed in graphite capsules, the alloy samples gained weight due to the formation of a variety of Cr3C2, Cr7C3, Mo2C and Cr23C6, carbide phases on the surface and in the subsurface regions of the alloy. A Cr depleted region wasmore » observed in the near-surface region where Mo thermally diffused toward either surface or grain boundary, which induced approximately 1.4 μm Ni3Fe alloy layer in this region. The carbide containing layer extended to about 7 μm underneath the Ni3Fe layer. The presence of graphite dramatically changes the mechanisms of corrosion attack in Hastelloy N in molten FLiBe salt. Evaluated by in terms of the depth of attack, graphite clearly accelerates corrosion, but the results appear to indicate that the formation of Cr23C6 phase might stabilize the Cr and mitigate its dissolution in molten FLiBe salt.« less

  2. Synthesis, Characterization, and Catalytic Activity of Sulfided Silico-Alumino-Titanate (Si-Al-Ti) Mixed Oxides Xerogels Supported Ni-Mo Catalyst

    SciTech Connect

    Al-Adwani, H.A.; Anthony, R.G.; Gardner, T.J.; Thammachote, N.

    1999-02-24

    Layered semicrystalline silico-alumino-titanate (Si-Al-Ti) mixed oxides were synthesized by a modified sol-gel method with hydrothermal synthesis temperatures less than 200 C and autogenic pressure. The solid products are semicrystalline materials with a surface area of 136-367 m{sup 2}/g and a monomodal pore size distribution with an average pore diameter of 3.6-4.7 nrn. The catalytic activity for pyrene hydrogenation in a batch reactor at 300 C and 500 psig was determined for sulfided Ni-Mo supported on the Si-Al-Ti mixed oxide. The activity was a function of the support composition the heat treatment before and after loading the active metals, the addition of organic templates, and different methods of metal loading. The most active sulfided Ni-Mo/Si-Al-Ti catalyst has an activity in the same range as the commercial catalyst, Shell 324, but the metal loading is 37% less than the commercial catalyst.

  3. Feasibility of ceramic joining with high energy electron beams

    SciTech Connect

    Turman, B.N.; Glass, S.J.; Halbleib, J.A.; Helmich, D.R.; Loehman, R.E.; Clifford, J.R.

    1995-01-01

    Joining structural ceramics is possible using high melting point metals such as Mo and Pt that are heated with a high energy electron beam, with the potential for producing joints with high temperature capability. A 10 MeV electron beam can penetrate through 1 cm of ceramic, offering the possibility of buried interface joining. Because of transient heating and the lower heat capacity of the metal relative to the ceramic, a pulsed high power beam has the potential for melting the metal without decomposing or melting the adjacent ceramic. The authors have demonstrated the feasibility of the process with a series of 10 MeV, 1 kW electron beam experiments. Shear strengths up to 28 NTa have been measured for Si{sub 3}N{sub 4}-Mo-Si{sub 3}N{sub 4}. These modest strengths are due to beam non-uniformity and the limited area of bonding. The bonding mechanism appears to be a thin silicide reaction layer. Si{sub 3}N{sub 4}-Si{sub 3}N{sub 4} joints with no metal layer were also produced, apparently bonded an yttrium apatite grain boundary phase.

  4. Development of diagnostic tools for the EUV spectral range

    NASA Astrophysics Data System (ADS)

    Mann, Klaus R.; Kranzusch, Sebastian; Eckert, G.; Peth, Christian; Schaefer, Bernd

    2002-07-01

    The successful implementation of EUV lithography systems strongly relies both on the efficiency of the employed optical components and the precise control of the relevant source parameters. Utilizing a laser-based plasma source for the generation of 13nm radiation, metrology for comprehensive characterization of EUV radiation and the related optics is developed at Laser-Laboratorium Goettingen. A soft X-ray plasma is produced with the help of a Nd:YAG laser which is focused into a pulsed xenon or oxygen gas jet. The alternate use of these two target gases accomplishes either a very intense broadband emission (Xe), or a less intense narrow-band line emission (O2) at the wavelength of 13nm. Additional filtering with the help of Mo/Si mirrors yields quasi-monochromatic 13nm radiation, as needed for testing of optical components, especially reflectometry. The performance of the EUV source is monitored with respect to source diameter, emission characteristics, and 13nm conversion efficiency by the help of different diagnostic tools, including EUV sensitive pin-hole cameras, photo-diodes and an EUV spectrometer. Moreover, first wavefront measurements of EUV radiation are performed with the help of a Hartmann wavefront analyzer, which was sensibilized for 13nm radiation.

  5. The Electrical Contact for Higher Manganese Silicide Thermoelectric Material

    NASA Astrophysics Data System (ADS)

    Shi, Xinghua; Zamanipour, Zahra; Vashaee, Daryoosh

    2011-03-01

    The Electrical Contact for Higher Manganese Silicide Thermoelectric Material Xinghua Shi, Zahra Zamanipour, Daryoosh Vashaee Several electrical contact materials for Higher Manganese Silicide (HMS) are introduced. HMS is useful thermoelectric material for medium to high temperature applications. We have investigated several materials including Co, Ni, Cr, Ti, Mo, MnSi, MoSi2, and TiSi2 in search of the best contact material to HMS. The low electrical resistivity and reliability of the contact are two important elements to make a high efficient TE device. Moreover, the contact must maintain its chemical, mechanical, thermal, and electrical properties over a broad range of temperature (20C-700C). The investigated elemental metals failed to make reliable contact in terms of mechanical and chemical stability at high temperature. In contrast, the investigated metal silicides showed superior stability over extended operation at high temperature. The thermal stability and strong mechanical bonding of TiSi2 C54 phase and MnSi were specially observed. Their ohmic contact resistance was also within the range of interest over the whole range of temperature (10-5 -10-4 Ω cm2) . This work was supported by AFOSR High Temperature Materials and NSF under contract CBET0933763.

  6. Fine pattern fabrication property of binary mask and attenuated phase shift mask

    NASA Astrophysics Data System (ADS)

    Yamazaki, Taichi; Kojima, Yosuke; Yamana, Mitsuharu; Haraguchi, Takashi; Tanaka, Tsuyoshi

    2009-04-01

    For 45nm and 32nm node technology, the challenges for resolution and CD control of mask patterns become the steeper mountain path. Especially, Sub Resolution Assist Feature (SRAF) is the smallest pattern on mask and amplifies the difficulty of mask fabrication. In order to improve the resolution of fine patterns, the influence of wet processing cannot be neglected, because it causes the pattern collapsing. Wet processing of mask-making can be divided into resist development and cleaning. In this study, the root causes of pattern collapsing are investigated at each wet processing. It is confirmed that thin resist can enhance the resolution limit of resist pattern and hard-mask blank, such as OMOG: Opaque MoSi On Glass, is suitable for thinner resist under 1500A. The pattern collapsing of OMOG is compared with that of Att.PSM at the cleaning before and after Cr stripping. Mask inspection finds that pattern collapsing can be suppressed by OMOG at both cleanings. It is because OMOG has lower cleaning stress than Att.PSM due to lower aspect-ratio. This benefit is demonstrated by cleaning stress simulation. Additionally, it is found that the SRAF size of OMOG can be wider than Att.PSM by optical simulation. From these results, OMOG has much advantage of fine pattern fabrication and is the optimal blank for 32nm node and beyond.

  7. Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective

    SciTech Connect

    Barkusky, Frank; Peth, Christian; Mann, Klaus; Feigl, Torsten; Kaiser, Norbert

    2005-10-15

    In order to generate high-energy densities of 13.5 nm radiation, an extreme ultraviolet (EUV) Schwarzschild mirror objective with a numerical aperture of 0.44 and a demagnification of 10 was developed and adapted to a compact laser-based EUV source. The annular spherical mirror substrates were coated with Mo/Si multilayer systems. With a single mirror reflectance of more than 65% the total transmittance of the Schwarzschild objective exceeds 40% at 13.5 nm. From the properties of the EUV source (pulse energy 3 mJ at 13.5 nm and plasma diameter approximately 300 {mu}m), energy densities of 73 mJ/cm{sup 2} at a pulse length of 6 ns can be estimated in the image plane of the objective. As a first application, the formation of color centers in lithium fluoride crystals by EUV radiation was investigated. F{sub 2}, F{sub 3}, and F{sub 3}{sup +} color centers could be identified by absorption spectroscopy. The formation dynamics was studied as a function of the EUV dose. By imaging of a pinhole positioned behind the plasma, an EUV spot of 5 {mu}m diameter was generated, which accomplishes direct writing of color centers with micrometer resolution.

  8. A Preliminary Investigation of the Cr3Si-Mo Pseudo-Binary Phase Diagram

    NASA Technical Reports Server (NTRS)

    Dickerson, R. M.; Raj, S. V.; Locci, I. E.

    1995-01-01

    An investigation was undertaken to study the phase relations in Cr3Si alloyed with Mo varying from 10 to 83.5 wt. % of the material. Specimens were prepared from arc-melted buttons that were subsequently heat treated at 1673 K for 200 h and air quenched to room temperature to structures. Alloys containing more than 20 wt. % MO were primarily two-phase materials of M3Si and M5Si3, where M is (Cr,Mo). Three alloys contained less than 5% of a third phase, which also had the M5Si3 crystal structure. Differential thermal analysis (DTA) was performed on several specimens at temperatures up to 2073 K in order to determine a solidus curve for the M3Si phase. Since only one DTA peak was observed in each alloy, the M5Si3 phase must melt above 2073 K, the maximum temperature examined. A preliminary pseudo-binary phase diagram for (Cr,Mo)3Si and a portion of the 1673 K isothermal section of the Cr-Mo-Si ternary phase diagram are presented.

  9. Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) for technology, biomedical, and metrology applications

    NASA Astrophysics Data System (ADS)

    Bartnik, Andrzej; Fiedorowicz, Henryk; Jarocki, Roman; Kostecki, Jerzy; Rakowski, Rafał; Sawicka, Magdalena; Szczurek, Mirosław

    2008-12-01

    In this paper some results of investigations concerning interaction of EUV radiation with inorganic and organic materials were presented. Samples of different materials were irradiated with a 10 Hz laser - plasma EUV source based on a gas puff target. The source was equipped with grazing incidence and multilayer collecting mirrors. The grazing incidence collector was used in experiments concerning surface modification and micromachining of different materials. The micromachining experiments were performed for different polymers that were irradiated through a fine metal grid as a contact mask. For fluoropolymers, EUV radiation with fluence of 10 mJ/cm2 was enough for efficient photo-etching. The photo-etching speed was maximal for polytetrafluoroethylene (PTFE) reaching 30nm per shot. It was shown that using such a method microstructures with high aspect ratio could be produced. Experiments connected with surface modification were performed either with organic or inorganic materials. Different kinds of surface structures were obtained depending on irradiated materials and irradiation parameters. The Mo/Si collector together with argon plasma was used for obtaining a quasi-monochromatic radiation for EUV microscopy and some metrological applications.

  10. Analysis of a New High-Toughness Ultra-high-Strength Martensitic Steel by Transmission Electron Microscopy and Atom Probe Tomography

    NASA Astrophysics Data System (ADS)

    Hartshorne, Matthew I.; McCormick, Caroline; Schmidt, Michael; Novotny, Paul; Isheim, Dieter; Seidman, David N.; Taheri, Mitra L.

    2016-04-01

    The microstructure of a new martensitic high-strength steel (Fe-0.40C-3.81Ni-1.31Cr-1.50Si-0.75Mn-0.52Mo-0.51Cu-0.30V) with high fracture toughness is characterized by transmission electron microscopy and atom probe tomography (APT). MC, M6C, and M23C6 precipitates form inside the martensitic lath matrix. The fracture toughness is insensitive to the dissolution of M23C6 precipitates at austenitizing temperatures above 1164 K (891 °C). APT reveals that solute segregation at the prior austenite grain boundaries (PAGB) is not uniform, with C, Mo, Si, Ni, and/or P enrichment varying at different areas of the PAGB. Si depletion is detected in the same area as the highest C enrichment. Carbon also segregates at lath boundaries. Segregation of C indicates the presence of retained austenite films at both PAGB and lath boundaries. Regions enriched in C up to 10 pct were found within the laths; however, no regions were enriched to the level expected of cementite or ɛ-carbide. The observed C distribution and high fracture toughness indicates that the tempering behavior is significantly different than that observed in 300M steel. The effect of Si, Ni, and Cu on the formation and stabilization of the regions of C enrichment and retained austenite require further study, as it may be key to the increased toughness.

  11. Structure and properties of composites synthesized in situ using solid state displacement reactions

    SciTech Connect

    Henager, C.H. Jr.; Brimhall, J.L.

    1993-10-01

    Solid state displacement reactions can produce in situ intermetallic and ceramic matrix composites in a process where an intermetallic or ceramic phase(s) and a potential reinforcing phase(s) are grown together during a solid state reaction. Interpenetrating and dispersed microstructures, important for desirable composite properties, have been produced by means of displacement reaction processing techniques. Two such composites have been synthesized which exhibit two distinct microstructures: MoSi{sub 2} reinforced with SiC particles, which exhibits a dispersed-phase structure, and NiAl/Ni{sub 3}Al reinforced with Al{sub 2}O{sub 3}, which exhibits an interpenetrating-phase structure. Strength in bending and chevron-notch fracture toughness have been determined as a function of temperature, and measured properties compare favorably with composites produced by other means. The measured properties are discussed with regard to the observed microstructures. The potential for displacement reaction processing is assessed, and it appears to be a cost-effective synthesis method compared to others.

  12. Focus ion beam-induced mechanical stress switching in an ultra-fast resistive switching device

    NASA Astrophysics Data System (ADS)

    Yang, Xiang

    2016-06-01

    The Mo/Si3N4:Pt/Pt nanometallic resistive switching devices with ultra-fast write/erase speed (<50 ns) were fabricated. Other than conventional electrical switching, a mechanical stress-induced switching was demonstrated. Such mechanical stress was provided by momentum transfer of 30 keV Ga+ ions in a focus ion beam system, enabling a one-way high resistance state (HRS) to low resistance state (LRS) transition. The capability of mechanical stress switching provides evidence that electron trapping/detrapping mechanism is responsible for nanometallic resistive switching. It was further demonstrated that HRS (trapping state) is a meta-stable state, while LRS (detrapping state) is a stable state. Strong mechanical stress facilitates local bond distortion in dielectric films and thus lowers the energy barrier between HRS and LRS, eventually leading to a barrier-less state transition. A quantitative model based on stress-mediated parallel conduction paths were established to provide a more accurate description of the resistive switching devices.

  13. New Fiber Reinforced Waterless Concrete for Extraterrestrial Structural Applications

    NASA Technical Reports Server (NTRS)

    Toutanji, H.; Tucker, D.; Ethridge, E.

    2005-01-01

    Commercial use of sulfur concrete on Earth is well established, particularly in corrosive, e.g., acid and salt, environments. Having found troilite (FeS) on the Moon raises the question of using extracted sulfur as a lunar construction mate: iii an attractive alternative to conventional concrete as it does not require water For the purpose of this paper it is assumed that lunar ore is mined, refined, and the raw sulfur processed with appropriate lunar regolith to form, for example, brick and beam elements. Glass fibers produced from regolith were used as a reinforcement to improve the mechanical properties of the sulfur concrete. Glass fibers and glass rebar were produced by melting the lunar regolith simulant. Lunar regolith stimulant was melted in a 25 cc Pt-Rh crucible in a Sybron Thermoline 46100 high temperature MoSi2 furnace at melting temperatures of 1450 to 1600G. The glass melt wets the ceramic rod and long continuous glass fibers were easily hand drawn. The glass fibers were immediately coated with a protective polymer to maintain the mechanical strength. The viability of sulfur concrete as a construction material for extraterrestrial application is presented. The mechanical properties of the glass fiber reinforced sulfur concrete were investigated.

  14. Performance of "Waterless Concrete"

    NASA Technical Reports Server (NTRS)

    Toutanji, H. A.; Grugel, R. N.

    2009-01-01

    Waterless concrete consists of molten elementary sulfur and aggregate. The aggregates in a lunar environment will be lunar rocks and soil. Sulfur is present on the Moon in Troilite soil (FeS) and, by oxidation of the soil, iron and sulfur can be produced. Sulfur concrete specimens were cycled between liquid nitrogen (approx.]91 C) and room temperature (^21 C) to simulate exposure to a lunar environment. Cycled and control specimens were subsequently tested in compression at room temperatures (^21 C) and ^-101 C. Test results showed that due to temperature cycling, the compressive strength of cycled specimens was 20% of those non-cycled. This reduction in strength can be attributed to the large differences in thermal coefficients of expansion of the materials constituting the concrete which promoted cracking. Similar sulfur concrete mixtures were strengthened with short and long glass fibres. The lunar regolith simulant was melted in a 25 cc Pt- Rh crucible in a Sybron Thermoline high temperature MoSi2 furnace at melting temperatures of 1450 to 1600 C for times of 30 min to i hour. Glass fibres and small rods were pulled from the melt. The glass fibres were used to reinforce sulfur concrete plated to improve the flexural strength of the sulfur concrete. Beams strengthened with glass fibres showed to exhibit an increase in the flexural strength by as much as 45%.

  15. Adsorption and electron-induced polymerization of methyl methacrylate on Ru(1010)

    SciTech Connect

    Hedhili, M. N.; Yakshinskiy, B. V.; Wasielewski, R.; Ciszewski, A.; Madey, T. E.

    2008-05-07

    The adsorption and electron irradiation of methyl methacrylate (MMA) on a Ru(1010) surface have been studied using x-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD), and low energy ion scattering. TPD analysis indicates that a monolayer of MMA chemisorbs and dissociates on the Ru(1010) surface. The reaction products observed upon heating include H{sub 2}, CO, CO{sub 2}, and a small amount of MMA. Physisorbed multilayers of MMA desorb at temperatures around 170 K. Electron irradiation of physisorbed MMA at 140 K leads to a modification of the MMA film: The XPS spectra show an increase in thermal stability of the film with retention of the MMA structure, and indicate that electron irradiation induces polymerization. An increase in the electron bombardment fluence induces a degradation of the formed polymerized species and leads to the accumulation of carbon on the Ru surface. These results are relevant to the accumulation of carbon on surfaces of Ru films that serve as capping layers on Mo/Si multilayer mirrors used in extreme ultraviolet lithography.

  16. Performance of GFIS mask repair system for various mask materials

    NASA Astrophysics Data System (ADS)

    Aramaki, Fumio; Kozakai, Tomokazu; Matsuda, Osamu; Yasaka, Anto; Yoshikawa, Shingo; Kanno, Koichi; Miyashita, Hiroyuki; Hayashi, Naoya

    2014-10-01

    We have developed a new focused ion beam (FIB) technology using a gas field ion source (GFIS) for mask repair. Meanwhile, since current high-end photomasks do not have high durability in exposure nor cleaning, some new photomask materials are proposed. In 2012, we reported that our GFIS system had repaired a representative new material "A6L2". It is currently expected to extend the application range of GFIS technology for various new materials and various defect shapes. In this study, we repaired a single bridge, a triple bridge and a missing hole on a phase shift mask (PSM) of "A6L2", and also repaired single bridges on a binary mask of molybdenum silicide (MoSi) material "W4G" and a PSM of high transmittance material "SDC1". The etching selectivity between those new materials and quartz were over 4:1. There were no significant differences of pattern shapes on scanning electron microscopy (SEM) images between repair and non-repair regions. All the critical dimensions (CD) at repair regions were less than +/-3% of those at normal ones on an aerial image metrology system (AIMS). Those results demonstrated that GFIS technology is a reliable solution of repairing new material photomasks that are candidates for 1X nm generation.

  17. Assessment of precipitation behavior in dental castings of a Co-Cr-Mo alloy.

    PubMed

    Yamanaka, Kenta; Mori, Manami; Chiba, Akihiko

    2015-10-01

    This study investigated solute portioning and precipitation in dental castings of a Co-Cr-Mo alloy and discussed their effects on alloy performance, in particular, the mechanical properties. Samples of a commercial Co-29Cr-6Mo (mass%) alloy were prepared using a dental-casting machine. The precipitates formed owing to the partitioning behaviors of the alloying elements were investigated using scanning electron microscopy, electron backscatter diffraction analysis, electron probe microanalysis, and transmission electron microscopy. The prepared samples exhibited a very coarse face-centered-cubic γ-phase dendritic structure with an average grain size of a few millimeters. A large number of precipitates, which decomposed further into complex interdendritic constituents (σ- and M23C6 carbide phases) were observed in the interdendritic regions rich in Cr, Mo, Si, and C. A reaction between the σ-phase and carbon is probably responsible for the carbide M23C6; however, this reaction did not occur to completion in the current case in spite of slow cooling (i.e., long exposure to elevated temperatures) in dental casting. While these precipitates result in high strength (hardness) and/or brittleness, the properties can be improved further by optimizing the alloy composition and the manufacturing process. The results of this study shed light on the significance of precipitation control in dental castings of Co-Cr-Mo alloys and should aid in the design of novel biomedical Co-Cr-based dental alloys that exhibit better performances. PMID:26164217

  18. Mask degradation monitoring with aerial mask inspector

    NASA Astrophysics Data System (ADS)

    Tseng, Wen-Jui; Fu, Yung-Ying; Lu, Shih-Ping; Jiang, Ming-Sian; Lin, Jeffrey; Wu, Clare; Lifschitz, Sivan; Tam, Aviram

    2013-06-01

    As design rule continues to shrink, microlithography is becoming more challenging and the photomasks need to comply with high scanner laser energy, low CDU, and ever more aggressive RETs. This give rise to numerous challenges in the semiconductor wafer fabrication plants. Some of these challenges being contamination (mainly haze and particles), mask pattern degradation (MoSi oxidation, chrome migration, etc.) and pellicle degradation. Fabs are constantly working to establish an efficient methodology to manage these challenges mainly using mask inspection, wafer inspection, SEM review and CD SEMs. Aerial technology offers a unique opportunity to address the above mask related challenges using one tool. The Applied Materials Aera3TM system has the inherent ability to inspect for defects (haze, particles, etc.), and track mask degradation (e.g. CDU). This paper focuses on haze monitoring, which is still a significant challenge in semiconductor manufacturing, and mask degradation effects that are starting to emerge as the next challenge for high volume semiconductor manufacturers. The paper describes Aerial inspector (Aera3) early haze methodology and mask degradation tracking related to high volume manufacturing. These will be demonstrated on memory products. At the end of the paper we take a brief look on subsequent work currently conducted on the more general issue of photo mask degradation monitoring by means of an Aerial inspector.

  19. Atom probe tomography investigation of lath boundary segregation and precipitation in a maraging stainless steel.

    PubMed

    Thuvander, Mattias; Andersson, Marcus; Stiller, Krystyna

    2013-09-01

    Lath boundaries in a maraging stainless steel of composition 13Cr-8Ni-2Mo-2Cu-1Ti-0.7Al-0.3Mn-0.2Si-0.03C (at%) have been investigated using atom probe tomography following aging at 475 °C for up to 100 h. Segregation of Mo, Si and P to the lath boundaries was observed already after 5 min of aging, and the amount of segregation increases with aging time. At lath boundaries also precipitation of η-Ni₃(Ti, Al) and Cu-rich 9R, in contact with each other, takes place. These co-precipitates grow with time and because of coarsening the area number density decreases. After 100 h of aging a ∼5 nm thick film-like precipitation of a Mo-rich phase was observed at the lath boundaries. From the composition of the film it is suggested that the phase in question is the quasicrystalline R' phase. The film is perforated with Cu-rich 9R and η-Ni₃(Ti, Al) co-precipitates. Not all precipitate types present in the matrix do precipitate at the lath boundaries; the Si-containing G phase and γ'-Ni₃(Ti, Al, Si) and the Cr-rich α' phase were not observed at the lath boundaries. PMID:23234833

  20. The art of photomask materials for low-k1-193nm lithography

    NASA Astrophysics Data System (ADS)

    Hashimoto, Masahiro; Iwashita, Hiroyuki; Mitsui, Hideaki

    2009-04-01

    The resolution of photomask patterns were improved with a hardmask (HM) system. The system which is thin Sicompounds layer is easily etched by the hyper-thin resist (below 100nm thickness). The HM material has sufficient etching selectivity against the chrome-compounds which is the second layer chrome absorber for the phase-shifter. This hardmask layer has been completely removed during the phase-shifter etching. It means that the conventional phase-shit mask (PSM) has been made with the ultimately high-resolution without configuration changes. Below 50nm resolution of PSM was made with 90nm thickness resist on HM layer in this paper. The CD bias between a resist feature CD and a chrome feature CD was almost zero (below 1nm) in the optimized etching condition. We confirmed that the mask performances were the equal to COMS (Cr-HM on MoSi binary mask) in resolution and CD linearity. The performances of hardmask blanks will be defined by resist performance because of almost zero bias.

  1. Effects of gravity on combustion synthesis of functionally graded biomaterials

    NASA Astrophysics Data System (ADS)

    Moore, J.; Schowengerdt, F.; Ayers, R.; Castillo, M.; Zhang, X.; Umakoshi, U.; Yi, C.; Guigne, J.

    Combustion synthesis, or self-propagating, high temperature synthesis (SHS) is currently being used at the Colorado School of Mines to produce advanced materials for biomedical applications. These biomaterials include ceramic, intermetallic, and metal-matrix composites for applications ranging from structural to oxidation- and wear-resistant materials, e.g., TiC-Ti, TiC-Cr3 C2 , MoSi2 - SiC, NiAl-TiB2 , to engineered porous composites, e.g., B4 C-A l2 O3 , Ti-TiBx , Ni-Ti, Ca 3 (PO4 )2 and glass- ceramic composites, e.g., CaO-SiO2 - B a O-A l2 O3 -T i B2 . The goal of the functionally graded biomaterials project is to develop new materials, graded in porosity and composition, which will combine the desirable mechanical properties of implant, e.g., NiTi, with the bone-growth enhancement properties of porous biodegradable ceramics, e.g., Ca 3 (PO4 )2 . Recent experiments on the NASA parabolic flight (KC- 135) aircraft have shown that gravity plays an important role in controlling the structure and properties of materials produced by combustion synthesis. The results of these studies, which will be presented at the conference, will provide valuable input to the design of experiments to be done in Space-DRUMSTM, a containerless materials processing facility scheduled to be placed on the International Space Station in 2003.

  2. Method to adjust multilayer film stress induced deformation of optics

    DOEpatents

    Mirkarimi, Paul B.; Montcalm, Claude

    2000-01-01

    A buffer-layer located between a substrate and a multilayer for counteracting stress in the multilayer. Depositing a buffer-layer having a stress of sufficient magnitude and opposite in sign reduces or cancels out deformation in the substrate due to the stress in the multilayer. By providing a buffer-layer between the substrate and the multilayer, a tunable, near-zero net stress results, and hence results in little or no deformation of the substrate, such as an optic for an extreme ultraviolet (EUV) lithography tool. Buffer-layers have been deposited, for example, between Mo/Si and Mo/Be multilayer films and their associated substrate reducing significantly the stress, wherein the magnitude of the stress is less than 100 MPa and respectively near-normal incidence (5.degree.) reflectance of over 60% is obtained at 13.4 nm and 11.4 nm. The present invention is applicable to crystalline and non-crystalline materials, and can be used at ambient temperatures.

  3. Area-selected Ion Milling for Reflection Wavefront Error Correction of Soft X-ray Multilayer Mirrors

    SciTech Connect

    Tsuru, Toshihide; Sakai, Yu; Hatano, Tadashi; Yamamoto, Masaki

    2010-06-23

    For accurate reflection wavefront error correction of imaging soft X-ray multilayer mirrors, a period-by-period ion milling system was developed. A stable and homogenized radial distribution of ion beam was realized for an ion milling over a whole area of 100 mm-wide multilayer. To demonstrate the wavefront error correction principle, a dielectric multilayer mirror for visible light was locally milled by our system. Wavefront as measured by a phase shifting interferometer showed the reflection phase of local milling multilayer advanced. Area-selected ion millings with mask templates made of Mo and Si, and by photoresist contact masks were carried out. Although striped patterns generated by the difference of spectroscopic reflectance between Mo and Si were observed at peripherals of milling area when templates were used, a clear and sharp edge pattern was obtained with contact mask. Soft X-ray reflectance of a Mo/Si multilayer milled with photoresist contact mask showed good feasibility of precise wavefront error correction of multilayers. These results proved our phase correction method is promising and practical for the 0.1 nm-period correction of soft X-ray multilayer mirror.

  4. Influence of particle bombardment on microstructure and internal stresses of refractory metal suicides on silicon

    NASA Astrophysics Data System (ADS)

    Hardtke, Ch.; Schilling, W.; Ullmaier, H.

    1991-07-01

    First results on microstructural changes and stress relaxation in thin refractory metal suicide films (TaSi 2 and MoSi 2) caused by particle bombardment are reported. The polycrystalline films had initial tensile stresses of some 10 9 Pa. Exposed to irradiation with Ge ions of 400 keV, both suicides showed a similar stress relaxation behaviour as a function of dose. During room-temperature implantation the initial tensile stress rapidly decreased and turned into compressive stress. Continuous irradiation partly relaxed the compressive stress and resulted in a saturation value of some -10 8 Pa. With increasing implantation temperature, the buildup of compressive stress gradually vanished, leaving only the initial decrease of tensile stress which finally approached zero. Based on microstructural investigations (TEM and X-ray diffraction) it is proposed to explain this behaviour by the combined action of two processes: relaxation of tensile stress by a volume increase due to irradiation-induced amorphization, and Frenkel defect production and relaxation of compressive stress by irradiation-induced densification of amorphous regions and/or Frenkel defect elimination.

  5. Synthesis and design of silicide intermetallic materials. 1998 annual progress report

    SciTech Connect

    Petrovic, J.J.; Castro, R.G.; Butt, D.P.; Park, Y.; Vaidya, R.U.; Hollis, K.J.; Kung, H.H.

    1999-03-01

    The overall objective of this program is to develop structural silicide-based materials with optimum combinations of elevated temperature strength/creep resistance, low temperature fracture toughness, and high temperature oxidation and corrosion resistance for applications of importance to the US processing industry. A further objective is to develop silicide-based prototype industrial components. The ultimate aim of the program is to work with industry to transfer the structural silicide materials technology to the private sector in order to promote international competitiveness in the area of advanced high temperature materials and important applications in major energy-intensive US processing industries. The program presently has a number of developing industrial connections, including a CRADA with Johns Manville Corporation targeted at the area of MoSi{sub 2}-based high temperature materials and components for fiberglass melting and processing applications. The authors are also developing an interaction with the Institute of Gas Technology (IGT) to develop silicides for high temperature radiant gas burner applications, for the glass and other industries. With Combustion Technology Inc., they are developing silicide-based periscope sight tubes for the direct observation of glass melts. With Accutru International Corporation, they are developing silicide-based protective sheaths for self-verifying temperature sensors which may be used in glass furnaces and other industrial applications. The progress made on the program in this period is summarized.

  6. DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)

    NASA Astrophysics Data System (ADS)

    Yakshinskiy, B. V.; Wasielewski, R.; Loginova, E.; Hedhili, M. N.; Madey , T. E.

    2008-10-01

    The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions [high vacuum, and 13.5 nm (92 eV) photons]. Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H 2O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is ˜6 × 10 -19 cm 2. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is ˜0.02 electrons/photon at 92 eV.

  7. Microstructures and oxidation behavior of some Molybdenum based alloys

    SciTech Connect

    Ray, Pratik Kumar

    2011-01-01

    The advent of Ni based superalloys revolutionized the high temperature alloy industry. These materials are capable of operating in extremely harsh environments, comprising of temperatures around 1050 C, under oxidative conditions. Demands for increased fuel efficiency, however, has highlighted the need for materials that can be used under oxidative conditions at temperatures in excess of 1200 C. The Ni based superalloys are restricted to lower temperatures due to the presence of a number of low melting phases that melt in the 1250 - 1450 C, resulting in softening of the alloys above 1000 C. Therefore, recent research directions have been skewed towards exploring and developing newer alloy systems. This thesis comprises a part of such an effort. Techniques for rapid thermodynamic assessments were developed and applied to two different systems - Mo-Si alloys with transition metal substitutions (and this forms the first part of the thesis) and Ni-Al alloys with added components for providing high temperature strength and ductility. A hierarchical approach towards alloy design indicated the Mo-Ni-Al system as a prospective candidate for high temperature applications. Investigations on microstructures and oxidation behavior, under both isothermal and cyclic conditions, of these alloys constitute the second part of this thesis. It was seen that refractory metal systems show a marked microstructure dependence of oxidation.

  8. Multilayer-coated laminar grating with 16{percent} normal-incidence efficiency in the 150-{Angstrom} wavelength region

    SciTech Connect

    Seely, J. F.; Kowalski, M. P.; Cruddace, R. G.; Rife, J. C.; Osterried, K.; Kleineberg, U.; Menke, D. Hunter, W. R.

    1997-11-01

    We characterized a laminar grating with a Mo/Si multilayer coating by using synchrotron radiation and atomic force microscopy. The grating substitute had 2400 grooves/mm, 40-{Angstrom} groove depth, and 2080-{Angstrom} groove width. The microroughness of the grating substrate was 5 {Angstrom} rms. The multilayer coating was optimized to have peak normal-incidence reflectance at a wavelength near 150 {Angstrom}. For an angle of incidence of 10{degree} the peak grating efficiency was 16.3{percent} in the +1 order and 15.0{percent} in the {minus}1 order. The efficiency in the zero order was lower by a factor of 40 owing to the excellent matching of the groove depth and groove width to the wavelength of the incident radiation. By dividing the grating efficiencies by the measured reflectance of the multilayer coating, we obtained inferred groove efficiencies of 34{percent} and 32{percent} in the +1 and {minus}1 orders, respectively. {copyright} 1997 Optical Society of America

  9. Understanding Particle Defect Transport in an Ultra-Clean Sputter Coating Process

    SciTech Connect

    Walton, C; Kearney, P; Folta, J; Sweeney, D; Mirkarimi, P

    2003-03-24

    Low-defect mask blanks remain a key technical challenge to Extreme Ultraviolet Lithography (EUVL). The mask blank is ion-beam sputter-coated with an 81-layer Mo/Si multilayer stack for high reflectance at {lambda} = 13.4nm. The current mask coating process can achieve a median added defect level of 0.05 defects/cm{sup 2} (12 added defects 90nm or larger on a 200mm Si-wafer test substrate), but this must be reduced by about a factor of 10 to meet mask cost requirements for EUVL. To further reduce the particle defect level, we have studied pathways for particle transport, using test particles and particles native to the coating process, and combined the results into a computational model of particle transport in an ion-beam sputter system. At process pressure, gas drag is negligible for particles above 100nm, so particles travel ballistically until they hit a surface. Bounce from chamber walls allows particles to reach all surfaces in the chamber if they have initial velocities above {approx}100m/s. The ion beam has sufficient momentum to entrain slower particles and accelerate them toward the sputter target, where some can bounce to the substrate. The model shows preliminary agreement with experimental defect distributions on witness wafers at various positions within the coating chamber.

  10. Direct photo-etching of poly(methyl methacrylate) using focused extreme ultraviolet radiation from a table-top laser-induced plasma source

    SciTech Connect

    Barkusky, Frank; Peth, Christian; Bayer, Armin; Mann, Klaus

    2007-06-15

    In order to perform material interaction studies with intense extreme ultraviolet (EUV) radiation, a Schwarzschild mirror objective coated with Mo/Si multilayers was adapted to a compact laser-based EUV plasma source (pulse energy 3 mJ at {lambda}=13.5 nm, plasma diameter {approx}300 {mu}m). By 10x demagnified imaging of the plasma a pulse energy density of {approx}75 mJ/cm{sup 2} at a pulse length of 6 ns can be achieved in the image plane of the objective. As demonstrated for poly(methyl methacrylate) (PMMA), photoetching of polymer surfaces is possible at this EUV fluence level. This paper presents first results, including a systematic determination of PMMA etching rates under EUV irradiation. Furthermore, the contribution of out-of-band radiation to the surface etching of PMMA was investigated by conducting a diffraction experiment for spectral discrimination from higher wavelength radiation. Imaging of a pinhole positioned behind the plasma accomplished the generation of an EUV spot of 1 {mu}m diameter, which was employed for direct writing of surface structures in PMMA.

  11. Lasers, extreme UV and soft X-ray

    SciTech Connect

    Nilsen, Joseph

    2015-09-20

    Three decades ago, large ICF lasers that occupied entire buildings were used as the energy sources to drive the first X-ray lasers. Today X-ray lasers are tabletop, spatially coherent, high-repetition rate lasers that enable many of the standard optical techniques such as interferometry to be extended to the soft X-ray regime between wavelengths of 10 and 50 nm. Over the last decade X-ray laser performance has been improved by the use of the grazing incidence geometry, diode-pumped solid-state lasers, and seeding techniques. The dominant X-ray laser schemes are the monopole collisional excitation lasers either driven by chirped pulse amplification (CPA) laser systems or capillary discharge. The CPA systems drive lasing in neon-like or nickel-like ions, typically in the 10 – 30 nm range, while the capillary system works best for neon-like argon at 46.9 nm. Most researchers use nickel-like ion lasers near 14 nm because they are well matched to the Mo:Si multilayer mirrors that have peak reflectivity near 13 nm and are used in many applications. As a result, the last decade has seen the birth of the X-ray free electron laser (XFEL) that can reach wavelengths down to 0.15 nm and the inner-shell Ne laser at 1.46 nm.

  12. Fabrication, strength and oxidation of molybdenum-silicon-boron alloys from reaction synthesis

    NASA Astrophysics Data System (ADS)

    Middlemas, Michael Robert

    Mo-Si-B alloys are a leading candidate for the next generation of jet turbine engine blades and have the potential to raise the operating temperatures by 300-400°C, which would dramatically increase power and efficiency. The alloys of interest are a three-phase mixture of the molybdenum solid solution (Moss) and two intermetallic phases, Mo3Si (A15) and Mo5SiB2 (T2). A novel powder metallurgical method was developed which uses the reaction of molybdenum, silicon nitride (Si3N4) and boron nitride (BN) powders to synthesize a fine dispersion of the intermetallic phases in a Moss matrix. The covalent nitrides are stable in oxidizing environments up to 1000ºC, allowing for fine particle processing without the formation of silicon and boron oxides. The process developed uses standard powder processing techniques to create Mo-Si-B alloys in a less complex and expensive manner than previously demonstrated. The formation of the intermetallic phases was examined by thermo-gravimetric analysis and x-ray diffraction. The start of the reactions to form the T2 and A15 phases were observed at 1140°C and 1193°C and the reactions have been demonstrated to be complete in as little as two hours at 1300°C. This powder metallurgy approach yields a fine dispersion of intermetallics in the Moss matrix, with average grain sizes of 2-4mum. Densities up to 95% of theoretical were attained from pressureless sintering at 1600°C and full theoretical density was achieved by hot-isostatic pressing (HIP). Low temperature sintering and HIPing was attempted to limit grain growth and to reduce the equilibrium silicon concentration in the Moss matrix. Sintering and HIPing at 1300°C reduced the grain sizes of all three phases by over a factor of two. Powder metallurgy provides an opportunity for microstructure control through changes in raw materials and processing parameters. Microstructure examination by electron back-scatter diffraction (EBSD) imaging was used to precisely define the

  13. Characterization of elemental and polycyclic aromatic hydrocarbon compositions of urban air in Brisbane

    NASA Astrophysics Data System (ADS)

    Lim, McKenzie C. H.; Ayoko, Godwin A.; Morawska, Lidia

    Characterization of the elemental and polycyclic aromatic hydrocarbons (PAHs) compositions of urban air was undertaken at three major sites in Brisbane, Australia. 17 elements and 16 US EPA priority PAHs were quantified at the sites. The most commonly detected elements in the TSP and PM 2.5 fractions were Al, Cd, Co, Cr, Cu, Fe, Mn, Mo, Si, Sn, Sr and Zn. Compared to the two other sites, PM 2.5 was found to contain higher concentrations of Zr, Mo, V, Al, Mn and Sr at the Queensland University of Technology (QUT) site. In contrast, the Woolloongabba sampling site, which was highly influenced by the vehicular emission and local industrial activities, has higher concentrations of Co, Sn, Cu, Zn and Mg while ANZ site has significantly lower concentration levels of most elements than the other sites; possibly due to the shielding effect of the nearby bush and forest. NAP, PHE, ANT, FLT, PYR and CRY were the most widespread PAHs found in all sites. But only QUT and Woolloongabba bus platform sites had detectable levels of the most carcinogenic US EPA PAH, BAP. The multi-criteria decision making procedures, Preference Ranking Organisation Method for Enrichment Evaluation (PROMETHEE) and Geometrical Analysis for Interactive Aid (GAIA) were used to rank the air samples and to identify the sources of the pollutants. Thus Woolloongabba bus platform was ranked as the most polluted site on the basis of the elemental and PAH compositions of its air samples while Woolloongabba bus platform and QUT sites were ranked as the worst polluted sites in terms of PAHs and PM 2.5 elemental contents, respectively.

  14. Investigation of Thickness Dependence of Metal Layer in Al/Mo/4H-SiC Schottky Barrier Diodes.

    PubMed

    Lee, Seula; Lee, Jinseon; Kang, Tai-Young; Kyoung, Sinsu; Jung, Eun Sik; Kim, Kyung Hwan

    2015-11-01

    In this paper, we present the preparation and characterization of Schottky barrier diodes based on silicon carbide with various Schottky metal layer thickness values. In this structure, molybdenum and aluminum were employed as the Schottky barrier metal and top electrode, respectively. Schottky metal layers were deposited with thicknesses ranging from 1000 to 3000 Å, and top electrodes were deposited with thickness as much as 3000 Å. The deposition of both metal layers was performed using the facing target sputtering (FTS) method, and the fabricated samples were annealed with the tubular furnace at 300 degrees C under argon ambient for 10 min. The Schottky barrier height, series resistance, and ideality factor was calculated from the forward I-V characteristic curve using the methods proposed by Cheung and Cheung, and by Norde. For as-deposited Schottky diodes, we observed an increase of the threshold voltage (V(T)) as the thickness of the Schottky metal layer increased. After the annealing, the Schottky barrier heights (SBHs) of the diodes, including Schottky metal layers of over 2000 Å, increased. In the case of the Schottky metal layer deposited to 1000 Å, the barrier heights decreased due to the annealing process. This may have been caused by the interfacial penetration phenomenon through the Schottky metal layer. For variations of V(T), the SBH changed with a similar tendency. The ideality factor and series resistance showed no significant changes before or after annealing. This indicates that this annealing condition is appropriate for Mo SiC structures. Our results confirm that it is possible to control V(T) by adjusting the thickness of the Schottky metal layer. PMID:26726688

  15. Interdiffusion Behavior in y-Phase U-Mo Alloy Versus Al-6061 Alloy Couples Fabricated by Friction Stir Welding

    SciTech Connect

    Dennis D. Keiser, Jr.

    2007-09-01

    To better understand interactions between fuel and cladding in research reactor fuels, diffusion couples between y-phase U-7 wt% Mo and U-10 wt% Mo alloy fuels and a Si-bearing, Al alloy were fabricated using a friction stir welding technique. The advantage of such a fabrication technique is that it can potentially reduce the amount of aluminum-oxide that might be present at the diffusion couple interface. The presence of oxides at the interface can affect the interdiffusion process. These couples were annealed and characterized using a scanning electron microscope equipped with energy-dispersive and wavelength-dispersive spectrometers. Images were taken of the developed diffusion structures; x-ray maps were generated to identify partitioning behavior of the various components; and, point-to-point analysis was employed to generate composition profiles and to determine phase compositions. To try and determine how the presence of Si in an Al alloy affects the interdiffusion behavior of fuel and cladding components in research reactor nuclear fuels, the results from this study were compared to those from earlier diffusion studies using U-Mo alloys and Al. The formed diffusion zones in some samples annealed for 30 minutes are comprised of Si-rich aluminide phases that appear to be (U,Mo)0.9(Al,Si)4 and (U,Mo)(Si,Al)2, based on composition. The diffusion rates observed and the types of phases that form can be correlated to the stability of the y-U phase, which is a metastable phase. For a sample annealed for a much longer time, large diffusion structures formed and no Si-rich phases were observed.

  16. Optical constants of materials in the EUV/soft x-ray region for multilayer mirror applications

    SciTech Connect

    Soufli, R

    1997-12-01

    The response of a given material to an incident electromagnetic wave is described by the energy dependent complex index of refraction n = 1 {minus} {delta} + i{beta}. In the extreme ultraviolet (EUV)/soft x-ray spectral region, the need for accurate determination of n is driven by activity in areas such as synchrotron based research, EUV/x-ray lithography, x-ray astronomy and plasma applications. Knowledge of the refractive index is essential for the design of the optical components of instruments used in experiments and applications. Moreover, measured values of n may be used to evaluate solid state models for the optical behavior of materials. The refractive index n of Si, Mo and Be is investigated in the EUV/soft x-ray region. In the case of Si, angle dependent reflectance measurements are performed in the energy range 50--180 eV. The optical constants {delta}, {beta} are both determined by fitting to the Fresnel equations. The results of this method are compared to the values in the 1993 atomic tables. Photoabsorption measurements for the optical constants of Mo are performed on C/Mo/C foils, in the energy range 60--930 eV. Photoabsorption measurements on Be thin films supported on silicon nitride membranes are performed, and the results are applied in the determination of the absorption coefficient of Be in the energy region 111.5--250 eV. The new results for Si and Mo are applied to the calculation of normal incidence reflectivities of Mo/Si and Mo/Be multilayer mirrors. These calculations show the importance of accurate knowledge of {delta} and {beta} in the prediction and modeling of the performance of multilayer optics.

  17. Development of silicide coating over molybdenum based refractory alloy and its characterization

    NASA Astrophysics Data System (ADS)

    Chakraborty, S. P.; Banerjee, S.; Sharma, I. G.; Suri, A. K.

    2010-08-01

    Molybdenum based refractory alloys are potential candidate materials for structural applications in high temperature compact nuclear reactors and fusion reactors. However, these alloys being highly susceptible to oxidation in air or oxygen at elevated temperature, undergoes severe losses from highly volatile molybdenum trioxide species. Present investigation, therefore, examines the feasibility of development of silicide type of coating over molybdenum base TZM alloy shape (Mo > 99 wt.%) using pack cementation coating technique. TZM alloy was synthesized in this laboratory from oxide intermediates of MoO 2, TiO 2 and ZrO 2 in presence of requisite amount of carbon, by alumino-thermic reduction smelting technique. The arc melted and homogenized samples of TZM alloy substrate was then embedded in the chosen and intimately mixed pack composition consisting of inert matrix (Al 2O 3), coating powder (Si) and activator (NH 4Cl) taken in the judicious proportion. The sealed charge packs contained in an alumina crucible were heated at temperatures of 1000 °C for 8-16 h heating cycle to develop the coating. The coating phase was confirmed to be of made of MoSi 2 by XRD analysis. The morphology of the coating was studied by SEM characterization. It had revealed that the coating was diffusion bonded where Si from coating diffused inward and Mo from TZM substrate diffused outward to form the coating. The coating was found to be resistant to oxidation when tested in air up to 1200 °C. A maximum 100 μm of coating thickness was achieved on each side of the substrate.

  18. Evaluating Impacts of CO2 and CH4 Gas Intrusion into an Unconsolidated Aquifer: Fate of As and Cd

    SciTech Connect

    Lawter, Amanda R.; Qafoku, Nikolla; Shao, Hongbo; Bacon, Diana H.; Brown, Christopher F.

    2015-07-10

    Abstract The sequestration of carbon dioxide (CO2) in deep underground reservoirs has been identified as an important strategy to decrease atmospheric CO2 levels and mitigate global warming, but potential risks on overlying aquifers currently lack a complete evaluation. In addition to CO2, other gases such as methane (CH4) may be present in storage reservoirs. This paper explores for the first time the combined effect of leaking CO2 and CH4 gasses on the fate of major, minor and trace elements in an aquifer overlying a potential sequestration site. Emphasis is placed on the fate of arsenic (As) and cadmium (Cd) released from the sediments or present as soluble constituents in the leaking brine. Results from macroscopic batch and column experiments show that the presence of CH4 (at a concentration of 1 % in the mixture CO2/CH4) does not have a significant effect on solution pH or the concentrations of most major elements (such as Ca, Ba, and Mg). However, the concentrations of Mn, Mo, Si and Na are inconsistently affected by the presence of CH4 (i.e., in at least one sediment tested in this study). Cd is not released from the sediments and spiked Cd is mostly removed from the aqueous phase most likely via adsorption. The fate of sediment associated As [mainly sorbed arsenite or As(III) in minerals] and spiked As [i.e., As5+] is complex. Possible mechanisms that control the As behavior in this system are discussed in this paper. Results are significant for CO2 sequestration risk evaluation and site selection and demonstrate the importance of evaluating reservoir brine and gas stream composition during site selection to ensure the safest site is being chosen.

  19. CD and profile metrology of EUV masks using scatterometry based optical digital profilometry

    NASA Astrophysics Data System (ADS)

    Cho, Sung-yong; Yedur, Sanjay; Kwon, Michael; Tabet, Milad

    2006-10-01

    Research and development efforts on EUV technology for the 32 nm node and beyond are progressing rapidly. Although a big concern is defect control on EUV mask blanks, control of linewidth and profile will be an important factor in acceptance of EUV technology. In this paper, we discuss the issues and strategies surrounding CD and profile metrology of EUV masks. EUV mask blanks from Hoya and Asahi Glass Company were used in this study, and were measured on a Nanometrics Atlas-M measurement tool, generating CD and profile results using Timbre Technologies' ODP analysis software. The Atlas-M tool has dual optics, enabling use of either normal incidence Reflectometry or oblique incidence Ellipsometry, either of which may be used for Scatterometry. The relative merits of each of these technologies are discussed. The complex EUV stack presents numerous challenges for metrology; the critical task is to accurately measure the optical constants of the numerous layers in the stack. The multilayer MoSi stack is effectively modeled as a single layer for optical constants determination. Photoresist FEP171 was used for the patterning, and the CD and profile of the resist were measured, after which the absorber layer was etched. Parameters characterized in this study include photoresist CD and height, etched Absorber CD, and capping layer over etch. Correlation to top-down CD-SEM, cross-sectional SEM, and AFM is reported. No charging or other deformation was observed on the EUV masks. The data show that ODP Scatterometry provides a non-destructive method for monitoring resist CD and profile, as well as etched structure CD and over/underetch on EUV masks.

  20. Influence of heat treatments on microstructure, mechanical properties, and corrosion resistance of weld alloy 625

    SciTech Connect

    Cortial, F.; Corrieu, J.M.; Vernot-Loier, C.

    1995-05-01

    The effects of heat treatments of the industrial type on the structural, mechanical, and corrosion resistance characteristics of weld alloy 625 have been studied. During the heat treatment, the mean concentration ratios of Nb, Mo, Si, Cr, Ni, and Fe elements between the interdendritic spaces and dendrite cores show little evolution up to 850 C. Beyond that temperature, this ratio approximates 1, and the composition heterogeneity has practically disappeared at 1,000 C. An eight-hour heat treatment at temperatures between 650 C and 750 C results in increased mechanical strength values and reduced ductility and impact strength linked to the precipitation of body-centered tetragonal metastable intermetallic {gamma}{double_prime} Ni{sub 3}Nb phase in the interdendritic spaces. An eight-hour treatment in the temperature range between 750 C and 950 C has catastrophic effects on all mechanical characteristics in relation with the precipitation, in the interdendritic spaces, of the stable orthorhombic intermetallic {delta} Ni{sub 3}(Nb, Mo, Cr, Fe, Ti) phase. At 1,000 C, the ductility and impact strength are restored. However, the higher the beat treatment temperature, the weaker the mechanical strength. Heat treatments have no effect on the pitting resistance of weld alloy 625 in sea water. The comparison of the results of this study on weld alloy 625 with those previously obtained on forged metal 625 shows that heat treatments below 650 C and above 1,000 C are the sole treatments to avoid embrittlement and impairment of the corrosion resistance characteristics of alloy 625.

  1. EUVL defect printability: an industry challenge

    NASA Astrophysics Data System (ADS)

    Kwon, Hyuk Joo; Teki, Ranganath; Harris-Jones, Jenah; Cordes, Aaron

    2012-02-01

    Extreme ultraviolet (EUV) patterning appears feasible using currently available EUV exposure tools, but some issues must still be resolved for EUV patterning to be used in production. Defects in EUV mask blanks are one such major issue, as evidenced by the research focused on defect printability. Inspection tools are needed to detect phase defects on EUV mask blanks that could possibly print on the wafer. Currently available inspection tools can capture defects on the mask, but they also need to be able to classify possible printable defects. Defect classification for repair and mitigation of printable defects is very difficult using DUV inspection tools; however, if the actinic inspection tool (AIT) could gather defect information from more multilayer stacks, it may be able to separate printable defects from unprintable defects. If unprintable defects could be eliminated, the defect information could be used for mask pattern shifts to reduce printable defects. Fewer defects would need to be repaired if there were a better chance of capturing printable defects using an actinic inspection tool. Being able to detect printable defects on EUV blanks is therefore critical in mask making. In this paper, we describe the characterization of native phase defects in the manufacturing of EUV mask blanks using the state-of-the-art mask metrology equipment in SEMATECH's Mask Blank Development Center (MBDC). Commercially available quartz substrates were used and Mo/Si multilayers were deposited on the substrates to characterize phase defects. Programmed defects of various dimensions were also prepared using e-beam patterning technology on which multilayers were deposited. Transmission electron microscopy (TEM) was used to study multilayer profile changes, while SEMATECH's AIT was used to image defects and predict their printability. A defect library for native defects and printability of programmed phase defects is introduced. Finally technical challenges for EUV defect

  2. Laser-plasma debris from a rotating cryogenic-solid-Xe target

    SciTech Connect

    Amano, Sho; Inaoka, Yutaka; Hiraishi, Hiroki; Miyamoto, Shuji; Mochizuki, Takayasu

    2010-02-15

    We investigate the characteristics of laser plasma debris that is responsible for damaging optics. The debris is composed of fast ions, neutral particles, and fragments, and originates from a solid Xe target on a rotating drum that we developed as an extreme ultraviolet (EUV) source. The ice fragments appear to be a problem most notably with solid Xe targets; however, we find that the damage induced by Xe ice fragments can be avoided by simply reducing the laser pulse energy. We find the number of fast neutral particles to be an order of magnitude less than the number of ions, and we clarify that the plasma debris is primarily composed of fast ions. In addition, we find that the number of fast ions having a few dozen keV of energy decreases when using the rotating target compared with the rest target. We attribute this to a gas curtain effect from the Xe gas localized at the rotating target surface. We estimate the sputtering rate of the Mo/Si mirror, which is caused primarily by the fast ions, to be 104 nm/1x10{sup 6} shots at 190 mm from the source plasma and at an 11.25 deg. angle from the incident laser beam. Up to the 1x10{sup 6} shots exposure, remarkable degradation of the mirror reflectivity is not observed though the sputtering damages the mirror. Mitigation of the ions by using gas and/or magnetic fields will further improve the mirror lifetime. By comparing with a liquid jet Xe target, we conclude that the sputtering rate per conversion efficiency when using the solid Xe targets on the rotating drum is the same as that when using the liquid Xe targets. The high conversion efficiency of 0.9% in the rotating drum solid Xe target makes this technique useful for developing laser plasma EUV sources.

  3. Comparative Evaluation of Mask Production CAR Development Process with Stepwise Defect Inspection

    NASA Astrophysics Data System (ADS)

    Jeong, Woo-Gun; Lee, Jung-Kwan; Park, Dong-Il; Park, Eu-Sang; Lee, Jong-Hwa; Seo, Sun-Kyu; Lee, Dong-Heok; Kim, Jin-Min; Choi, Sang-Soo; Jeong, Soo-Hong

    2002-12-01

    Chemically amplified resist (CAR) provides superior lithographic performance compared to traditional e-beam resists in production maskmaking. Parameters benefiting the most are contrast, resolution, and sensitivity. In spite of CAR's advantages, defect control and tighter 50KeV e-beam CAR process restrictions are significantly more critical thanks to smaller geometries, tighter CD specifications, and optical proximity correction (OPC) for 90nm node mask technology. Among defect root causes, resist development is considered to be the one of the most important steps because post-development residue can generate printable defects on finished masks. We investigated the CAR development process across different resist development methods, such as binary and fan-type nozzle spin spray, and puddle development. Several high density binary and embedded-attenuated phase shift masks (EAPSMs) with 70% clear area in the main pattern field were evaluated in an effort to identify and contain post-develop defects in a typical mask production flow. Development step process residue was examined at the after-develop inspection (ADI) step and scanning electron microscopy (SEM) was used for individual defect review. The KLA-Tencor SLF77 TeraStar inspection tool was used to inspect patterns after the development, Cr/MoSiON layer dry etch, and clean steps. The effectiveness of the various CAR development methods has been also studied following development, dry etch, and cleaning inspection by using identical binary and EAPSM masks from production. The mechanism and defect source during the stepwise process and inspections were scrutinized and discussed. Experimental results showed that stepwise process inspection was effective in identifying defects and their sources to prevent defects, and in optimizing each process step. It was found that CAR development and dry etch processes are the most important process steps to control defects in CAR-based mask production. Suggested optimized

  4. Galvanizing and Galvannealing Behavior of CMnSiCr Dual-Phase Steels

    NASA Astrophysics Data System (ADS)

    Lin, Ko-Chun; Chu, Peng-Wei; Lin, Chao-Sung; Chen, Hon-Bor

    2013-06-01

    Alloying elements, such as Mn, Mo, Si, and Cr, are commonly used to enhance the strength of advanced high-strength steels. Those elements also play an important role in the hot-dip galvanizing (GI) and galvannealing (GA) process. In this study, two kinds of CMnSiCr dual-phase steels were galvanized and galvannealed using a hot-dip simulator to investigate the effect of the alloying elements on the microstructure of the GI and GA coatings. The results showed that the dual-phase steels had good galvanizability because no bare spots were observed and the Fe-Zn phases were readily formed at the interface. However, the alloying reaction during the GA process was significantly hindered. XPS analysis showed that external oxidation occurred under an extremely low dew point [213 K to 203 K (-60 °C to -70 °C)] atmosphere during the annealing prior to hot dipping. However, most of the oxides were reduced during the GI process. After the GI process, the Al was present as solid solutes in the Fe-Zn phase, suggesting that the Fe-Zn phase was formed from the transformation of the Fe-Al inhibition alloy. Meanwhile, the solubility of Si in the ζ phase was extremely low. With continued GA reaction, the ζ phase transformed into the δ phase, which contained approximately 1.0 at.pct Si. The Si also diffused into the Zn layer during the GA reaction. Hence, the ζ phase did not homogeneously nucleate at the steel substrate/Zn coating interface, but was found at the area away from the interface. Therefore, the Fe-Zn phases on the CMnSiCr dual-phase steels were relatively non-uniform compared to those on interstitial-free steel.

  5. Computer studies of the surface mechanism of preferential sputtering of two-component solids. Ion beam analysis of surface composition in low dose regime

    NASA Astrophysics Data System (ADS)

    Samoilov, Vladimir N.; Tatur, Andrei E.; Yastrzhembsky, Vladimir I.

    1996-09-01

    We investigated the process of collision cascade propagation through the solid-vacuum boundary for two-component targets: WSi, MoSi and VSi. The surface mechanism of preferential sputtering of atoms of light component based on stronger deflection of light atoms towards surface normal when scattering by heavy neighbouring surface atoms during ejection was studied. Simulations for ejection of 450 000 Si or W atoms from the surface of WSi for cos {ϑ 0}/{E 02} and {1}/{E 02} initial distributions gave {Si}/{W} sputtering ratio equal to 1.29-1.55 (for 1:1 {Si}/{W} concentration ratio at the surface) giving necessary addition to the Andersen-Sigmund formula which underestimated that ratio in comparison with available experimental data. Analysis of integral energy distributions of atoms of the components gave {Si}/{W} ratio maximum equal to 3.18-5.00 for energy interval 0.0-0.4 eV. Maxima of integral energy distributions of sputtered atoms were observed at 1.8 eV for Si and 3.4 eV for W in calculations with equal binding energies for atoms of light and heavy components in good agreement with experiment. The surface mechanism was shown to be the alternative mechanism in formation of observed maxima difference with respect to nonidentity of binding energy values for atoms of components proposed by Szymonski [Phys. Lett. A 82 (1981) 203]. The two-cone structure of ejection vs. initial polar angle for Si atoms sputtered was revealed and explained. Results obtained gave the new approach to solve the inverse problem of reconstruction of surface composition in low dose SNMS and showed that the surface mechanism of preferential sputtering is to be accounted for in analytical calculations of surface composition. Ejection was simulated in the plane containing the neighbouring surface atom.

  6. Profile reconstruction in extreme ultraviolet (EUV) scatterometry: modeling and uncertainty estimates

    NASA Astrophysics Data System (ADS)

    Gross, H.; Rathsfeld, A.; Scholze, F.; Bär, M.

    2009-10-01

    Scatterometry as a non-imaging indirect optical method in wafer metrology is also relevant to lithography masks designed for extreme ultraviolet lithography, where light with wavelengths in the range of 13 nm is applied. The solution of the inverse problem, i.e. the determination of periodic surface structures regarding critical dimensions (CD) and other profile properties from light diffraction patterns, is incomplete without knowledge of the uncertainties associated with the reconstructed parameters. The numerical simulation of the diffraction process for periodic 2D structures can be realized by the finite element solution of the two-dimensional Helmholtz equation. The inverse problem can be formulated as a nonlinear operator equation in Euclidean space. The operator maps the sought mask parameters to the efficiencies of diffracted plane wave modes. We employ a Gauß-Newton type iterative method to solve this operator equation and end up minimizing the deviation of the measured efficiency or phase shift values from the calculated ones. We apply our reconstruction algorithm for the measurement of a typical EUV mask composed of TaN absorber lines of about 80 nm height, a period in the range of 420 nm-840 nm, and with an underlying MoSi-multilayer stack of 300 nm thickness. Clearly, the uncertainties of the reconstructed geometric parameters essentially depend on the uncertainties of the input data and can be estimated by various methods. We apply a Monte Carlo procedure and an approximative covariance method to evaluate the reconstruction algorithm. Finally, we analyze the influence of uncertainties in the widths of the multilayer stack by the Monte Carlo method.

  7. EUVL Mask Blank Repair

    SciTech Connect

    Barty, A; Mirkarimi, P; Stearns, D G; Sweeney, D; Chapman, H N; Clift, M; Hector, S; Yi, M

    2002-05-22

    EUV mask blanks are fabricated by depositing a reflective Mo/Si multilayer film onto super-polished substrates. Small defects in this thin film coating can significantly alter the reflected field and introduce defects in the printed image. Ideally one would want to produce defect-free mask blanks; however, this may be very difficult to achieve in practice. One practical way to increase the yield of mask blanks is to effectively repair multilayer defects, and to this effect they present two complementary defect repair strategies for use on multilayer-coated EUVL mask blanks. A defect is any area on the mask which causes unwanted variations in EUV dose in the aerial image obtained in a printing tool, and defect repair is correspondingly defined as any strategy that renders a defect unprintable during exposure. The term defect mitigation can be adopted to describe any strategy which renders a critical defect non-critical when printed, and in this regard a non-critical defect is one that does not adversely affect device function. Defects in the patterned absorber layer consist of regions where metal, typically chrome, is unintentionally added or removed from the pattern leading to errors in the reflected field. There currently exists a mature technology based on ion beam milling and ion beam assisted deposition for repairing defects in the absorber layer of transmission lithography masks, and it is reasonable to expect that this technology will be extended to the repair of absorber defects in EUVL masks. However, techniques designed for the repair of absorber layers can not be directly applied to the repair of defects in the mask blank, and in particular the multilayer film. In this paper they present for the first time a new technique for the repair of amplitude defects as well as recent results on the repair of phase defects.

  8. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.

    PubMed

    Bogachev, S A; Chkhalo, N I; Kuzin, S V; Pariev, D E; Polkovnikov, V N; Salashchenko, N N; Shestov, S V; Zuev, S Y

    2016-03-20

    We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3  nm, λ=17-21  nm, λ=28-33  nm, and λ=58.4  nm. We found new material pairs, which will make new spaceborne experiments possible due to the high reflection efficiencies, spectral resolution, and long-term stabilities of the proposed multilayer coatings. In the spectral range λ=13  nm, Mo/Be multilayer mirrors were shown to demonstrate a better ratio of reflection efficiency and spectral resolution compared with the commonly used Mo/Si. In the spectral range λ=17-21  nm, a new multilayer structure Al/Si was proposed, which had higher spectral resolution along with comparable reflection efficiency compared with the commonly used Al/Zr multilayer structures. In the spectral range λ=30  nm, the Si/B4C/Mg/Cr multilayer structure turned out to best obey reflection efficiency and long-term stability. The B4C and Cr layers prevented mutual diffusion of the Si and Mg layers. For the spectral range λ=58  nm, a new multilayer Mo/Mg-based structure was developed; its reflection efficiency and long-term stability have been analyzed. We also investigated intrinsic stresses inherent for most of the multilayer structures and proposed possibilities for stress elimination. PMID:27140543

  9. High efficiency multilayer blazed gratings for EUV and soft X-rays: Recent developments

    SciTech Connect

    Voronov, Dmitriy; Ahn, Minseung; Anderson, Erik; Cambie, Rossana; Chang, Chih-Hao; Goray, Leonid; Gullikson, Eric; Heilmann, Ralf; Salmassi, Farhad; Schattenburg, Mark; Warwick, Tony; Yashchuk, Valeriy; Padmore, Howard

    2011-07-26

    Multilayer coated blazed gratings with high groove density are the best candidates for use in high resolution EUV and soft x-ray spectroscopy. Theoretical analysis shows that such a grating can be potentially optimized for high dispersion and spectral resolution in a desired high diffraction order without significant loss of diffraction efficiency. In order to realize this potential, the grating fabrication process should provide a perfect triangular groove profile and an extremely smooth surface of the blazed facets. Here we report on recent progress achieved at the Advanced Light Source (ALS) in fabrication of high quality multilayer coated blazed gratings. The blazed gratings were fabricated using scanning beam interference lithography followed by wet anisotropic etching of silicon. A 200 nm period grating coated with a Mo/Si multilayer composed with 30 bi-layers demonstrated an absolute efficiency of 37.6percent in the 3rd diffraction order at 13.6 nm wavelength. The groove profile of the grating was thoroughly characterized with atomic force microscopy before and after the multilayer deposition. The obtained metrology data were used for simulation of the grating efficiency with the vector electromagnetic PCGrate-6.1 code. The simulations showed that smoothing of the grating profile during the multilayer deposition is the main reason for efficiency losses compared to the theoretical maximum. Investigation of the grating with cross-sectional transmission electron microscopy revealed a complex evolution of the groove profile in the course of the multilayer deposition. Impact of the shadowing and smoothing processes on growth of the multilayer on the surface of the sawtooth substrate is discussed.

  10. Direct die-to-database electron-beam inspection of fused silica imprint templates

    NASA Astrophysics Data System (ADS)

    Tsuneoka, M.; Hasebe, T.; Tokumoto, T.; Yan, C.; Yamamoto, M.; Resnick, D. J.; Thompson, E.; Wakamori, H.; Inoue, M.; Ainley, Eric; Nordquist, Kevin J.; Dauksher, William J.

    2006-10-01

    Imprint lithography has been included on the ITRS Lithography Roadmap at the 32 and 22 nm nodes. Step and Flash Imprint Lithography (S-FIL TM) is a unique method for printing sub-100 nm geometries. Relative to other imprinting processes S-FIL has the advantage that the template is transparent, thereby facilitating conventional overlay techniques. Further, S-FIL provides sub-100 nm feature resolution without the significant expense of multi-element, high quality projection optics or advanced illumination sources. However, since the technology is 1X, it is critical to address the infrastructure associated with the fabrication of templates. With respect to inspection, although defects as small as 70 nm have been detected using optical techniques, it is clear that it will be necessary to take advantage of the resolution capabilities of electron beam inspection techniques. The challenge is in inspecting templates composed purely of fused silica. This paper reports the inspection of both fused silica wafers and plates. The die-to-database inspection of the wafers was performed on an NGR2100 inspection system. Fused silica plates were inspected using an NGR4000 system. Three different experiments were performed. In the first study, Metal 1 and Logic patterns as small as 40 nm were patterned on a 200 mm fused silica wafer. The patterns were inspected using an NGR2100 die-to-database inspection system. In the second experiment, a 6025 fused silica plate was employed. Patterns with a limited field of view (FOV) were inspected using an NGR4000 reticle-based system. To test the tool's capability for larger FOVs, 16 × 16 μm areas on a MoSi half tone plate were scanned and stitched together to evaluate the tool's ability to reliably do die-to-database comparisons across larger inspection areas.

  11. Sources for beyond extreme ultraviolet lithography and water window imaging

    NASA Astrophysics Data System (ADS)

    O'Sullivan, Gerry; Li, Bowen; Dunne, Padraig; Hayden, Paddy; Kilbane, Deirdre; Lokasani, Ragava; Long, Elaine; Ohashi, Hayato; O'Reilly, Fergal; Sheil, John; Sheridan, Paul; Sokell, Emma; Suzuki, Chihiro; White, Elgiva; Higashiguchi, Takeshi

    2015-05-01

    Lithography tools are being built and shipped to semiconductor manufacturers for high volume manufacturing using extreme ultraviolet lithography (EUVL) at a wavelength of 13.5 nm. This wavelength is based on the availability of Mo/Si multilayer mirrors (MLMs) with a reflectivity of ˜70% at this wavelength. Moreover, the primary lithography tool manufacturer, ASML, has identified 6.x nm, where x˜7, as the wavelength of choice for so-called Beyond EUVL, based on the availability of La/B4C MLMs, with theoretical reflectance approaching 80% at this wavelength. The optimum sources have been identified as laser produced plasmas of Gd and Tb, as n = 4-n = 4 transitions in their ions emit strongly near this wavelength. However, to date, the highest conversion efficiency obtained, for laser to EUV energy emitted within the 0.6% wavelength bandwidth of the mirror is only 0.8%, pointing to the need to identify other potential sources or consider the selection of other wavelengths. At the same time, sources for other applications are being developed. Conventional sources for soft x-ray microscopy use H-like line emission from liquid nitrogen or carbon containing liquid jets which can be focused using zone plates. Recently the possibility of using MLMs with n = 4-n = 4 emission from a highly charged Bi plasma was proposed and subsequently the possibility of using Δn = 1 transitions in 3rd row transition elements was identified. All of these studies seek to identify spectral features that coincide with the reflectance characteristics of available MLMs, determine the conditions under which they are optimized and establish the maximum conversion efficiencies obtainable. Thus, there is a need for systematic studies of laser produced plasmas of a wide range of elements as some of the challenges are similar for all of these sources and some recent results will be presented.

  12. High-temperature corrosion of UNS N10003 in molten Li2BeF4 (FLiBe) salt

    SciTech Connect

    Zheng, Guiqiu; Kelleher, Brian; He, Lingfeng; Cao, Guoping; Anderson, Mark; Allen, Todd; Sridharan, Kumar

    2015-07-30

    Here, corrosion testing of Hastelloy N in molten fluoride salt was performed in purified molten 27LiF-BeF2 (66-34mol%) (FLiBe) salt at 700°C for 1000 hours, in pure nickel and graphite capsules. In the nickel capsule tests, the near-surface region of the alloy exhibited an about 200 nm porous structure, an approximately 3.5 μm chromium depleted region, and MoSi2 precipitates. In tests performed in graphite capsules, the alloy samples gained weight due to the formation of a variety of Cr3C2, Cr7C3, Mo2C and Cr23C6, carbide phases on the surface and in the subsurface regions of the alloy. A Cr depleted region was observed in the near-surface region where Mo thermally diffused toward either surface or grain boundary, which induced approximately 1.4 μm Ni3Fe alloy layer in this region. The carbide containing layer extended to about 7 μm underneath the Ni3Fe layer. The presence of graphite dramatically changes the mechanisms of corrosion attack in Hastelloy N in molten FLiBe salt. Evaluated by in terms of the depth of attack, graphite clearly accelerates corrosion, but the results appear to indicate that the formation of Cr23C6 phase might stabilize the Cr and mitigate its dissolution in molten FLiBe salt.

  13. Changes in hydrological patterns and climate variability for the past 1000 years in the southern Gulf of California

    NASA Astrophysics Data System (ADS)

    Pérez-Cruz, Ligia; Rodríguez, Alejandro; Roy, Priyadarsi; Urrutia-Fucugauchi, Jaime

    2013-04-01

    This study aims to document changes in hydrological patterns, variations in oxygenation and bio-productivity associated with regional climate conditions (v. gr. such a precipitation, cyclonic gyre and North America Monsoon) in the southern Gulf of California. A laminated sediment box core C36 was collected in Alfonso Basin, Bay of La Paz, southern Gulf of California, at 390 m depth. Total core length is 36.5 cm. The preliminary chronology for core C36 is based on 210-Pb and AMS radiocarbon dates. Samples were dried and grounded and bulk-sediment chemistry was measured using a Thermo Scientific Niton XL3t GOLDD X-ray fluorescence (XRF) analyzer. Major and trace elements were determined. The marine standard HISS-1 was used for calibration. The following elements and ratios are considered for the analysis: Al, Ba, Ca, Fe, K, Mo, Si, Ti, V and Zr and Zr/Al and Ba/Al, which are used as proxies of terrigenous input, oxygenation and bio-productivity. A total of 122 continuous measurements along the whole core were obtained. Element chemical concentrations and their stratigraphic distribution are interpreted in terms of changes in hydrological cycle and paleoproductivity in the region. According to the radiocarbon date the core spans 909 cal yr BP (AD 1041). We also considered 210-Pb dates from a core collected nearby to the C36. Sedimentation rates estimated are 0.6 and 0.34 mm/yr. Further dating is in progress. Magnetic susceptibility logging is used as indicator of mineral magnetic concentrations associated with diagenetic processes and terrigenous input. The Al, K, Si and Ti are used as proxies of terrigenous input, Zr/Al ratio is used as proxy of aeolian input, and Ba/Al ratio is a proxy of paloeproductivity.

  14. fs Laser surface nano-structuring of high refractory ceramics to enhance solar radiation absorbance

    NASA Astrophysics Data System (ADS)

    Cappelli, E.; Orlando, S.; Sciti, D.; Bellucci, A.; Lettino, A.; Trucchi, D. M.

    2014-10-01

    High refractory pressure-less sintered ternary composite ceramics of AlN-SiC-MoSi2 (ASMY), polished by mechanical grinding to a surface roughness R a ~40 nm, have been treated in vacuum by fs Ti:sapphire laser, operating at 800 nm wavelength, 100 fs pulse duration, and increasing fluence, to generate a "black ceramic material", able to minimize solar radiation reflectance, in such a way that they could be used as the absorber material in an innovative conversion module of solar radiation into electrical energy. Disk specimens of approximately 3 cm in diameter and 3 mm thick have been treated by normal incident laser beam, generating a scanning pattern of parallel lines, at a lateral distance of about 80 μm, using a stage in motion, in the x, y, z directions, driven by a computer. The experimental conditions of laser treatment (energy fluence, speed of transition and lateral distance of steps) have been optimized to maximize the absorption properties of the patterned surface. In some samples this value was increased by about 15 %, compared to untreated surface, up to a value of final absorbance of about 95 %, all over the range of solar radiation spectrum (from UV to NIR). The morphological and chemical effects have been evaluated by SEM-EDS analysis. At higher fluence, we obtained the characteristic ablation craters and corresponding local material decomposition, while at lower fluence (over the ablation threshold) an ordered periodic nano-structure has been obtained, exploitable for its high capacity of entrapment of visible light. The laser treated ceramic specimen, characterized by very high absorption properties and reflectivity values lower than 4 %, has been used as active absorber material in a conversion module, installed in a solar test platform.

  15. Sensitivity analysis for OMOG and EUV photomasks characterized by UV-NIR spectroscopic ellipsometry

    NASA Astrophysics Data System (ADS)

    Heinrich, A.; Dirnstorfer, I.; Bischoff, J.; Meiner, K.; Richter, U.; Mikolajick, T.

    2013-09-01

    We investigated the potentials, applicability and advantages of spectroscopic ellipsometry (SE) for the characterization of high-end photomasks. The SE measurements were done in the ultraviolet-near infrared (UVNIR) wavelength range from 300 nm to 980 nm, at angle of incidences (AOI) between 10 and 70° and with a microspot size of 45 x 10 μm2 (AOI=70°). The measured Ψ and 𝛥 spectra were modeled using the rigorous coupled wave analysis (RCWA) to determine the structural parameters of a periodic array, i.e. the pitch and critical dimension (CD). Two different types of industrial photomasks consisting of line/space structures were evaluated, the reflecting extreme ultraviolet (EUV) and the transmitting opaque MoSi on glass (OMOG) mask. The Ψ and 𝛥 spectra of both masks show characteristic differences, which were related to the Rayleigh singularities and the missing transmission diffraction in the EUV mask. In the second part of the paper, a simulation based sensitivity analysis of the Fourier coefficients α and β is presented, which is used to define the required measurement precision to detect a CD deviation of 1%. This study was done for both mask types to investigate the influence of the stack transmission. It was found that sensitivities to CD variations are comparable for OMOG and EUV masks. For both masks, the highest sensitivities appear close to the Rayleigh singularities and significantly increase at very low AOI. To detect a 1% CD deviation for pitches below 150 nm a measurement precision in the order of 0.01 is required. This measurement precision can be realized with advanced optical hardware. It is concluded that UV-NIR ellipsometry is qualified to characterize photomasks down to the 13 nm technology node in 2020.

  16. Seawater recharge into oceanic crust: IODP Exp 327 Site U1363 Grizzly Bare outcrop

    NASA Astrophysics Data System (ADS)

    Wheat, C. Geoffrey; Hulme, Samuel M.; Fisher, Andrew T.; Orcutt, Beth N.; Becker, Keir

    2013-06-01

    Systematic differences in sediment thermal and pore water chemical profiles from Integrated Ocean Drilling Program Site U1363 document mixing and reaction within the basaltic crust adjacent to Grizzly Bare outcrop, a site of hydrothermal recharge into 3.6 My-old basaltic crust. A transect of seven holes was drilled ~50 m to ~750 m away from the base of the outcrop. Temperatures at the sediment-basement interface increase from ~6°C to >30°C with increasing distance from the outcrop, and heat flow is suppressed within several hundred meters from the outcrop. Calculated fluid compositions at the sediment-basement interface are generally explained by mixing between bottom seawater and altered crustal basement fluids, with a composition similar but not identical to fluids from seeps at Baby Bare outcrop, located ~45 km to the northeast. Reactions within upper basement and overlying sediment affect a variety of ions (Mn, Fe, Mo, Si, PO43-, V, and U) and δ13DIC, indicating a diagenetic influence and diffusive exchange with overlying sediment pore waters. The apparent 14C age of basal pore fluids is much older than bottom seawater. Collectively, these results are consistent with seawater recharge at Grizzly Bare outcrop; however, there are strong gradients in fluid composition within 50 m of the outcrop, providing evidence for complex flow paths and vigorous mixing of young, recently recharged seawater with much older, more reacted basement fluid. The proximity of these altered fluids to the edge of the outcrop raises the possibility for fluid seepage from the outcrop in addition to seawater recharge.

  17. High-efficiency multilayer blazed gratings for EUV and soft x-rays: recent developments

    NASA Astrophysics Data System (ADS)

    Voronov, Dmitriy L.; Ahn, Minseung; Anderson, Eric H.; Cambie, Rossana; Chang, Chih-Hao; Goray, Leonid I.; Gullikson, Eric M.; Heilmann, Ralf K.; Salmassi, Farhad; Schattenburg, Mark L.; Warwick, Tony; Yashchuk, Valeriy; Padmore, Howard A.

    2010-09-01

    Multilayer coated blazed gratings with high groove density are the best candidates for use in high resolution EUV and soft x-ray spectroscopy. Theoretical analysis shows that such a grating can be potentially optimized for high dispersion and spectral resolution in a desired high diffraction order without significant loss of diffraction efficiency. In order to realize this potential, the grating fabrication process should provide a perfect triangular groove profile and an extremely smooth surface of the blazed facets. Here we report on recent progress achieved at the Advanced Light Source (ALS) in fabrication of high quality multilayer coated blazed gratings. The blazed gratings were fabricated using scanning beam interference lithography followed by wet anisotropic etching of silicon. A 200 nm period grating coated with a Mo/Si multilayer composed with 30 bi-layers demonstrated an absolute efficiency of 37.6% in the 3rd diffraction order at 13.6 nm wavelength. The groove profile of the grating was thoroughly characterized with atomic force microscopy before and after the multilayer deposition. The obtained metrology data were used for simulation of the grating efficiency with the vector electromagnetic PCGrate-6.1 code. The simulations showed that smoothing of the grating profile during the multilayer deposition is the main reason for efficiency losses compared to the theoretical maximum. Investigation of the grating with cross-sectional transmission electron microscopy revealed a complex evolution of the groove profile in the course of the multilayer deposition. Impact of the shadowing and smoothing processes on growth of the multilayer on the surface of the sawtooth substrate is discussed.

  18. Solar selective absorber coating for high service temperatures, produced by plasma sputtering

    NASA Astrophysics Data System (ADS)

    Lanxner, Michael; Elgat, Zvi

    1990-08-01

    Spectrally selective absorber coatings, deposited on engineering material substrates such as stainless steel, have been developed for service as efficient solar photothermal energy converters. The selective solar absorber is based on a multilayer of thin films, produced by sputtering. The main solar absorber is a metal/ceramic (cermet) composite, such as, Mo/Al2th or Mo/Si02, with a graded metal concentration. Such a cermet layer, strongly absorbs radiation over most of the range of the solar spectrum but is transparent to longer wavelength radiation. The cermet layer is deposited on a highly reflecting infrared metal layer. Two more layers were added: An AhO diffusion barrier layer which is deposited first on the substrate and an AI2O or a Si02 antireflection layer which is deposited on the top of the cermet film. In order to better understand the spectral reflectivity of the multilayered selective coating, a procedure for the calculation of the optical properties was developed. After the R&D development phase was successfully completed, a full scale production coating machine was constructed. The production machine is a linear in line coater. The selective coating is deposited on stainless steel tubes, translating in the coating machine while rotating about their axes, along their axial direction. Measurements of reflectance, solar absorptivity, a, thermal emissivity, C, and high temperature durability, are all parts of the quality control routine. The results show values of a in the range 0.96 - 0.98. The thermal emissivity at 350CC is in the range 0.16 - 0.18. Thermal durability tests, show no degradation of the coating when subjected to up to 65O in vacuum for one month and when passed through a temperature cycling test which includes 1200 cycles between temperatures of 150CC and 450CCfor a period of two months.

  19. Investigating printability of native defects on EUV mask blanks through simulations and experiments

    NASA Astrophysics Data System (ADS)

    Upadhyaya, Mihir; Jindal, Vibhu; Herbol, Henry; Jang, Il-Yong; Kwon, Hyuk Joo; Harris-Jones, Jenah; Denbeaux, Gregory

    2014-04-01

    Availability of defect-free masks is considered to be a critical issue for enabling extreme ultraviolet lithography (EUVL) as the next generation technology. Since completely defect-free masks will be hard to achieve, it is essential to have a good understanding of the defect printability as well as the fundamental aspects of a defect that result in the defects being printed. In this work, the native mask blank defects were characterized using atomic force microscopy (AFM) and cross-section transmission electron microscopy (TEM), and the defect printability of the characterized native mask defects was evaluated using finite-difference time-domain (FDTD) simulations. The simulation results were compared with the through-focus aerial images obtained at the SEMATECH Actinic Inspection Tool (AIT) at Lawrence Berkeley National Lab (LBNL) for the characterized defects. There was a reasonable agreement between the through-focus FDTD simulation results and the AIT results. To model the Mo/Si multilayer growth over the native defects, which served as the input for the FDTD simulations, a level-set technique was used to predict the evolution of the multilayer disruption over the defect. Unlike other models that assume a constant flux of atoms (of materials to be deposited) coming from a single direction, this model took into account the direction and incident fluxes of the materials to be deposited, as well as the rotation of the mask substrate, to accurately simulate the actual deposition conditions. The modeled multilayer growth was compared with the cross-section TEM images, and a good agreement was observed between them.

  20. Combined measurements of modulus and length and their correlation for different amorphous alloys

    SciTech Connect

    Porscha, B.; Neuhaeuser, H.

    1995-03-15

    Combined measurements of length and modulus change on the same specimen of Ni{sub 78}Si{sub 8}B{sub 14}, Cu{sub 64}Ti{sub 36} and Co{sub 66}Fe{sub 4}(MoSiB){sub 30} are presented. These properties are sensitive to different aspects of structural changes during relaxation in the amorphous state. The change of length is mainly sensitive to the topological long range relaxation. The change of the eigenfrequency is mainly sensitive to atomic rearrangements changing the chemical short range order. The results of the correlation between the effect of relaxation of frequency versus that of length can be described as follows: the observed structural relaxation in the amorphous states of each material can be divided up into two regimes. The first regime (I) with a prevailing change of eigenfrequency is attributed to short range rearrangements of the chemically different atomic species in the material; the second regime (II) with a larger amount of length change is interpreted as a long range topological relaxation with enhanced loss of free volume. This interpretation is supported by a comparison of the diffusion coefficients at the characteristic transition temperature {Tc} between the regimes I and II. It shows that the average diffusion path lengths of the possible diffusors below the characteristic temperature are in the order of 2 to 5 next neighbor distances, i.e., diffusion is only possible in a short range changing the species of neighboring atoms. Above {Tc}, the average diffusion path lengths are in the order of 5 to 50 next neighbor distances suggesting long range relaxation rearrangements by a diffusion process preferentially connected with the annihilation of free volume.

  1. Binary 193nm photomasks aging phenomenon study

    NASA Astrophysics Data System (ADS)

    Dufaye, Félix; Sartelli, Luca; Pogliani, Carlo; Gough, Stuart; Sundermann, Frank; Miyashita, Hiroyuki; Hidenori, Yoshioka; Charras, Nathalie; Brochard, Christophe; Thivolle, Nicolas

    2011-05-01

    193nm binary photomasks are still used in the semiconductor industry for the lithography of some critical layers for the nodes 90nm and 65nm, with high volumes and over long period. These 193nm binary masks seem to be well-known but recent studies have shown surprising degrading effects, like Electric Field induced chromium Migration (EFM) [1] or chromium migration [2] [3] . Phase shift Masks (PSM) or Opaque MoSi On Glass (OMOG) might not be concerned by these effects [4] [6] under certain conditions. In this paper, we will focus our study on two layers gate and metal lines. We will detail the effects of mask aging, with SEM top view pictures revealing a degraded chromium edge profile and TEM chemical analyses demonstrating the growth of a chromium oxide on the sidewall. SEMCD measurements after volume production indicated a modified CD with respect to initial CD data after manufacture. A regression analysis of these CD measurements shows a radial effect, a die effect and an isolated-dense effect. Mask cleaning effectiveness has also been investigated, with sulphate or ozone cleans, to recover the mask quality in terms of CD. In complement, wafer intrafield CD measurements have been performed on the most sensitive structure to monitor the evolution of the aging effect on mask CD uniformity. Mask CD drift have been correlated with exposure dose drift and isolated-dense bias CD drift on wafers. In the end, we will try to propose a physical explanation of this aging phenomenon and a solution to prevent from it occurring.

  2. Direct photoetching of polymers using radiation of high energy density from a table-top extreme ultraviolet plasma source

    SciTech Connect

    Barkusky, Frank; Bayer, Armin; Peth, Christian; Mann, Klaus

    2009-01-01

    In order to perform material interaction studies with intense extreme ultraviolet (EUV) radiation, a Schwarzschild mirror objective coated with Mo/Si multilayers was adapted to a compact laser-driven EUV plasma source utilizing a solid Au target. By 10x demagnified imaging of the plasma a maximum pulse energy density of {approx}0.73 J/cm{sup 2} at a wavelength of 13.5 nm can be achieved in the image plane of the objective at a pulse duration of 8.8 ns. In this paper we present EUV photoetching rates measured for polymethyl methacrylate, polycarbonate, and polytetrafluoroethylene at various fluence levels. A linear dependence between etch depth and applied EUV pulse number could be observed without the necessity for any incubation pulses. By evaluating the slope of these data, etch rates were determined, revealing also a linear behavior for low fluences. A threshold energy density could not be observed. The slope of the linear etch regime as well as deviations from the linear trend at higher energy densities are discussed and compared to data known from deep UV laser ablation. Furthermore, the surface roughness of the structured polymers was measured by atomic force microscopy and compared to the nonirradiated polymer surface, indicating a rather smooth etch process (roughness increase of 20%-30%). The different shapes of the etch craters observed for the three polymers at high energy densities can be explained by the measured fluence dependence of the etch rates, having consequences for the proper use of polymer ablation for beam profiling of focused EUV radiation.

  3. Early diagenesis of germanium in sediments of the Antarctic South Atlantic: In search of the missing Ge sink

    SciTech Connect

    King, S.L.; Froelich, P.N.; Jahnke, R.A.

    2000-04-01

    Pore water and solid-phase geochemistry profiles were obtained from several cores between 41{degree}S and 53{degree}S in the Atlantic sector of the Southern Ocean. Pore water nitrate, manganese, and iron profiles delineate standard redox zones in these sediments, and help characterize those with classic vs. burn-down behaviors. Pore water Si and Ge profiles demonstrate that Ge released during opal dissolution is removed pervasively throughout the uppermost interval of silicate release, and also downwards into the suboxic zone by as yet unidentified precipitation mechanisms. These results indicate that early diagenesis of Ge is uncoupled from that of opal. Solid-phase extractions (Fe, Mn, U, Mo, Ge, Cu, Ni, Co, V, and Cd) in a few cores suggest that anthigenic Ge removal in the suboxic zone is not associated with peaks in authigenic Mn cycling (MnO{sub 2} and related metals) but rather with processes deeper in the sediments, perhaps Fe or U diagenesis. Below the interval of Ge removal, pre water Ge increases linearly with depth by over two orders of magnitude, indicating a deep (below recovery) source of large magnitude. The fraction of opal-derived Ge precipitated authigenically in these sediments ranges from {approximately}1 to 96% and correlates strongly with the detrital fraction as well as the detrital to opal ratio, both of which generally decrease from north to south. The Ge sink observed in these sediments would need to be globally representative to account for the entire missing Ge sink in today's oceanic Ge balance, which seems unlikely. Benthic fluxes of Ge and Si estimated from these pore water profiles and from measurements in three benthic flux chamber experiments at high carbon-rain continental margin sites demonstrate that the Ge/Si rate released from the seafloor in locations with high benthic silicate and carbon fluxes is congruent with Holocene opal dissolution (Ge/Si {approximately} 0.7 x 10{sup {minus}6}). In contrast, Ge/Si flux ratios in areas

  4. Reactive ion etching of sputtered silicon carbide and tungsten thin films for device applications

    SciTech Connect

    Pan, W.S.

    1988-01-01

    For high temperature processing and device applications refractory materials, silicon carbide (SiC) and tungsten (W), are considered or evaluated as the basic semiconductor and metallization materials for integrated circuits. In order to pattern fine lines in SiC and W thin films, a selective and anisotropic etching technique is needed. First, materials properties, such as crystallinity, conductivity, refractive index, optical bandgap, etc., of sputtered silicon carbide (SiC) and tungsten (W) thin films have been investigated in conjunction with the rapid thermal annealing (RTA) technique. The RTA temperature dependence of the optical bandgap of SiC thin films has been obtained. High crystallinity W thin of low resistivity films were obtained using by RTA. Reactive ion etching (RIE) of SiC thin films in a variety of fluorinated gas plasmas, such as SF{sub 6}, CBrF{sub 3} and CHF{sub 3} mixed with oxygen has been investigated in depth. The emission spectra and induced DC bias of the RF plasma were monitored to explore the etching mechanisms. A SiC:Si etch ratio higher than unity was obtained for the first time by using CBrF{sub 3}/75%O{sub 2} and CHF{sub 3}/90%O{sub 2} at 200W, 20 sccm, 20mTorr plasma conditions. The best anisotropic profile was observed by using CHF{sub 3} gas in the RIE mode. A typical DC bias, -300V, is concluded from etching experiments to determine the dependence of SiC etch rate and physical reaction under RIE mode. RIE of tungsten (W) thin film was investigated by using the different fluorinated gas plasmas, such as CF{sub 4}, SF{sub 6}, CBrF{sub 3} and CHF{sub 3} mixed with oxygen. We have achieved our goal of selective patterning of tungsten films over SiC, Si, SiO{sub 2}, which required in order to use W in SiC device applications. A very good W:Si and W:SiO{sub 2} selective ratio, 4:1 and 4.8:1, were observed by using CHF{sub 3}/70%O{sub 2} gases under different Plasma conditions.

  5. Bi-Directional Isolated DC-DC Converter for Next-Generation Power Distribution—Comparison of Converters Using Si and SiC Devices

    NASA Astrophysics Data System (ADS)

    Biela, Juergen; Aggeler, Daniel; Inoue, Shigenori; Akagi, Hirofumi; Kolar, Johann W.

    In this paper two bi-directional DC-DC converters for a 1MW next-generation BTB system of a distribution system, as it is applied in Japan, are presented and compared with respect to design, efficiency and power density. One DC-DC converter applies commercially available Si-devices and the other one high voltage SiC switch, which consists of a SiC JFET cascode (MOSFET+1 JFET) in series with five SiC JFETs. In the comparison also the high frequency, high voltage transformer, which ensures galvanic isolation and which is a core element of the DC-DC converter, is examined in detail by analytic calculations and FEM simulations. For validating the analytical considerations a 20kW SiC DC-DC converter has been designed in detail. Measurement results for the switching and conduction losses have been acquired from the SiC and also for a Si system for calculating the losses of the scaled 1MW system.

  6. Hyperbolic metamaterial-based near-field thermophotovoltaic system for hundreds of nanometer vacuum gap.

    PubMed

    Jin, Seokmin; Lim, Mikyung; Lee, Seung S; Lee, Bong Jae

    2016-03-21

    Artificially designed hyperbolic metamaterial (HMM) possesses extraordinary electromagnetic features different from those of naturally existing materials. In particular, the dispersion relation of waves existing inside the HMM is hyperbolic rather than elliptical; thus, waves that are evanescent in isotropic media become propagating in the HMM. This characteristic of HMMs opens a novel way to spectrally control the near-field thermal radiation in which evanescent waves in the vacuum gap play a critical role. In this paper, we theoretically investigate the performance of a near-field thermophotovoltaic (TPV) energy conversion system in which a W/SiO2-multilayer-based HMM serves as the emitter at 1000 K and InAs works as the TPV cell at 300 K. By carefully designing the thickness of constituent materials of the HMM emitter, the electric power of the near-field TPV devices can be increased by about 6 times at 100-nm vacuum gap as compared to the case of the plain W emitter. Alternatively, in regards to the electric power generation, HMM emitter at experimentally achievable 100-nm vacuum gap performs equivalently to the plain W emitter at 18-nm vacuum gap. We show that the enhancement mechanism of the HMM emitter is due to the coupled surface plasmon modes at multiple metal-dielectric interfaces inside the HMM emitter. With the minority carrier transport model, the optimal p-n junction depth of the TPV cell has also been determined at various vacuum gaps. PMID:27136882

  7. Electrochromic behavior of W(x)Si(y)O(z) thin films prepared by reactive magnetron sputtering at normal and glancing angles.

    PubMed

    Gil-Rostra, Jorge; Cano, Manuel; Pedrosa, José M; Ferrer, Francisco Javier; García-García, Francisco; Yubero, Francisco; González-Elipe, Agustín R

    2012-02-01

    This work reports the synthesis at room temperature of transparent and colored W(x)Si(y)O(z) thin films by magnetron sputtering (MS) from a single cathode. The films were characterized by a large set of techniques including X-ray photoelectron spectroscopy (XPS), Rutherford backscattering spectrometry (RBS), Fourier transform infrared (FT-IR), and Raman spectroscopies. Their optical properties were determined by the analysis of the transmission and reflection spectra. It was found that both the relative amount of tungsten in the W-Si MS target and the ratio O(2)/Ar in the plasma gas were critical parameters to control the blue coloration of the films. The long-term stability of the color, attributed to the formation of a high concentration of W(5+) and W(4+) species, has been related with the formation of W-O-Si bond linkages in an amorphous network. At normal geometry (i.e., substrate surface parallel to the target) the films were rather compact, whereas they were very porous and had less tungsten content when deposited in a glancing angle configuration. In this case, they presented outstanding electrochromic properties characterized by a fast response, a high coloration, a complete reversibility after more than one thousand cycles and a relatively very low refractive index in the bleached state. PMID:22208156

  8. [Membrane surface fouling properties in MBRs for high-salinity wastewater treatment].

    PubMed

    Li, Bin; Wang, Zhi-Wei; An, Ying; Wu, Zhi-Chao

    2014-02-01

    The properties of membrane foulants in MBR treating high-salinity wastewater were studied. Results showed that the removal efficiency of organics and NH4(+) -N was stable and high-quality effluent was obtained after the operation time of 121 d; the ratio of VSS/ SS decreased and SVI declined at the same time, indicating that the inorganic content of sludge increased which might lead to more compact flocs and higher settling ability; SMP and EPS of the sludge were largely changed with a lower proportion of protein and a higher proportion of humic acid. Scanning electron microscope-energy diffusive X-ray analyzer (SEM-EDX) demonstrated that Na, Al, Mg, Ca, K, Fe, Ti, Cr, W, Si and Cl were the major inorganic elements in membrane foulants; Gel filtration chromatography (GFC) illustrated that there were organic matters with high molecular weight trapped by membrane and formed the membrane foulants; Fourier transform infrared (FTIR) spectroscopy and Excitation emission matrix (EEM) fluoresce spectroscopy discovered that carbohydrates, protein and humic acid were the main content of organics in membrane foulants.; quantitative analysis of membrane foulants showed that the amount of inorganic membrane foulants were significant when treating high-salinity wastewater. PMID:24812959

  9. Study of self-compliance behaviors and internal filament characteristics in intrinsic SiOx-based resistive switching memory

    NASA Astrophysics Data System (ADS)

    Chang, Yao-Feng; Fowler, Burt; Zhou, Fei; Chen, Ying-Chen; Lee, Jack C.

    2016-01-01

    Self-compliance characteristics and reliability optimization are investigated in intrinsic unipolar silicon oxide (SiOx)-based resistive switching (RS) memory using TiW/SiOx/TiW device structures. The program window (difference between SET voltage and RESET voltage) is dependent on external series resistance, demonstrating that the SET process is due to a voltage-triggered mechanism. The program window has been optimized for program/erase disturbance immunity and reliability for circuit-level applications. The SET and RESET transitions have also been characterized using a dynamic conductivity method, which distinguishes the self-compliance behavior due to an internal series resistance effect (filament) in SiOx-based RS memory. By using a conceptual "filament/resistive gap (GAP)" model of the conductive filament and a proton exchange model with appropriate assumptions, the internal filament resistance and GAP resistance can be estimated for high- and low-resistance states (HRS and LRS), and are found to be independent of external series resistance. Our experimental results not only provide insights into potential reliability issues but also help to clarify the switching mechanisms and device operating characteristics of SiOx-based RS memory.

  10. Two-dimensional trilayer grating with a metal/insulator/metal structure as a thermophotovoltaic emitter.

    PubMed

    Song, Jinlin; Si, Mengting; Cheng, Qiang; Luo, Zixue

    2016-02-20

    A thermophotovoltaic system that converts thermal energy into electricity has considerable potential for applications in energy utilization fields. However, intensive emission in a wide spectral and angular range remains a challenge in improving system efficiency. This study proposes the use of a 2D trilayer grating with a tungsten/silica/tungsten (W/SiO2/W) structure on a tungsten substrate as a thermophotovoltaic emitter. The finite-difference time-domain method is employed to simulate the radiative properties of the proposed structure. A broadband high emittance with an average spectral emittance of 0.953 between 600 and 1800 nm can be obtained for both transverse magnetic and transverse electric polarized waves. On the basis of the inductance-capacitance circuit model and dispersion relation analyses, this phenomenon is mainly considered as the combined contribution of surface plasmon polaritons and magnetic polaritons. A parametric study is also conducted on the emittance spectrum of the proposed structure, considering geometric parameters, polar angles, and azimuthal angles for both TM and TE waves. The study demonstrates that the emitter has good wavelength selectivity and polarization insensitivity in a wide geometric and angular range. PMID:26906580

  11. Recent Developments of Multilayer Mirror Optics for Laboratory X-ray Instrumentation

    NASA Astrophysics Data System (ADS)

    Michaelsen, Carsten; Wiesmann, Jörg; Hoffmann, C.; Wulf, K.; Brugemann, Lutz; Storm, A.

    2002-12-01

    In this paper we review various improvements that we made in the development of multilayer mirror optics for home-lab x-ray analytical equipment in recent years. For the detection of light elements using x-ray fluorescence spectrometry, we developed a number of new multilayers with improved detection limits. In detail, we found that La/B4C multilayers improve the detection limit of boron by 29 % compared to the previous Mo/B4C multilayers. For the detection of carbon, TiO2/C multilayers improve the detection limit also by 29 % compared to the V/C multilayers previously used. For the detection of aluminum, WSi2/Si or Ta/Si multilayers can lead to detection limit improvements over the current W/Si multilayers of up to 60 % for samples on silicon wafers. For the use as beam-conditioning elements in x-ray diffractometry, curved optics coated with laterally d-spacing graded multilayers give rise to major improvements concerning usable x-ray intensity and beam quality. Recent developments lead to a high quality of these multilayer optics concerning beam intensity, divergence, beam uniformity and spectral purity. For example, x-ray reflectometry instruments equipped with such multilayer optics have dynamic ranges previously only available at synchrotron sources. Two-dimensional focusing multilayer optics are shown to become essential optical elements in protein crystallography and structural proteomics.

  12. Technologies for manufacturing of high angular resolution multilayer coated optics for future new hard x-ray missions: a status report

    NASA Astrophysics Data System (ADS)

    Borghi, G.; Vernani, D.; Marchi Boscolo, E.; Citterio, O.; Grisoni, G.; Kools, J.; Marioni, F.; Orlandi, A.; Ritucci, A.; Rossi, M.; Salmaso, G.; Valsecchi, G.; Basso, S.; Pareschi, G.; Spiga, D.; Tagliaferri, G.; Negri, B.

    2009-08-01

    High throughput lightweight Hard X-ray Optics manufactured via electroforming replication process from supersmooth mandrels are the primary candidate for some of future New Hard X-ray missions. Media Lario Technologies (MLT) is the industrial enabler exploiting the electroforming technology initially applied for the ESA XMM-Newton mission and further developed in cooperation with Brera Astronomical Observatory (INAF/OAB). The current and ongoing development activities in Media Lario Technologies complement the electroforming technology with a suite of critical manufacturing and assembly of the Mirror Module Unit. In this paper, the progress on mandrels manufacturing, mirror shell replication, multilayer coating deposition, mirror module integration, and relevant metrology is reported in view of the upcoming production phase. Mandrel production is a key point in terms of performances and schedule; the results from of NiP prototype mandrels fabricated using a proprietary multistep surface finishing process are reported. The progress in the replication of ultrathin Nickel and Nickel-Cobalt substrates gold coated mirror shells is reported together with the results of MLT Magnetron Sputtering multilayer coating technology for the hard x-ray waveband and its application to W/Si. Due to the criticality of low thickness mirror handling, the integration concept has been refined and tested on prototype mechanical structures under full illumination UV vertical optical bench.

  13. Development of a prototype nickel optic for the Constellation-X hard x-ray telescope: III

    NASA Astrophysics Data System (ADS)

    Romaine, S.; Basso, S.; Bruni, R. J.; Burkert, W.; Citterio, O.; Conti, G.; Engelhaupt, D.; Freyberg, M. J.; Ghigo, M.; Gorenstein, P.; Gubarev, M.; Hartner, G.; Mazzoleni, F.; O'Dell, S.; Pareschi, G.; Ramsey, B. D.; Speegle, C.; Spiga, D.

    2005-08-01

    The Constellation-X (Con-X) mission planned for launch in 2015, will feature an array of Hard X-ray telescopes (HXT) with a total collecting area greater than 1500 cm2 at 40 keV. Two technologies are being investigated for the optics of these telescopes, including multilayer coated Electroformed-Nickel-Replicated (ENR) shells. The attraction of the ENR process is that the resulting full-shell optics are inherently stable and offer the prospect of better angular resolution which results in lower background and higher instrument sensitivity. We are building a prototype HXT mirror module using an ENR process to fabricate the individual shells. This prototype consists of 5 shells with diameters ranging from 150 mm to 280 mm with a length of 426 mm. The innermost of these will be coated with iridium, while the remainder will be coated with graded d-spaced W/Si multilayers. Parts I and II of this work were presented at the SPIE meetings in 2003 and 2004. This paper presents a progress update and focuses on accomplishments during this past year. In particular, we will present results from full illumination X-ray tests of multilayer coated shells, taken at the MPE-Panter X-ray facility.

  14. Development of a prototype nickel optic for the Constellation-X hard x-ray telescope: IV

    NASA Astrophysics Data System (ADS)

    Romaine, S.; Basso, S.; Bruni, R. J.; Burkert, W.; Citterio, O.; Conti, G.; Engelhaupt, D.; Freyberg, M. J.; Ghigo, M.; Gorenstein, P.; Gubarev, M.; Hartner, G.; Mazzoleni, F.; O'Dell, S.; Pareschi, G.; Ramsey, B. D.; Speegle, C.; Spiga, D.

    2006-06-01

    The Constellation-X mission planned for launch in 2015-2020 timeframe, will feature an array of Hard X-ray telescopes (HXT) with a total collecting area greater than 1500 cm2 at 40 keV. Two technologies are being investigated for the optics of these telescopes, one of which is multilayer-coated Electroformed-Nickel-Replicated (ENR) shells. The attraction of the ENR process is that the resulting full-shell optics are inherently stable and offer the prospect of better angular resolution which results in lower background and higher instrument sensitivity. We are building a prototype HXT mirror module using an ENR process to fabricate the individual shells. This prototype consists of 5 shells with diameters ranging from 15 cm to 28 cm with a length of 42.6 cm. The innermost of these will be coated with iridium, while the remainder will be coated with graded d-spaced W/Si multilayers. The assembly structure has been completed and last year we reported on full beam illumination results from the first test shell mounted in this structure. We have now fabricated and coated two (15 cm and 23 cm diameter) 100 micron thick shells which have been aligned and mounted. This paper presents the results of full beam illumination X-ray tests, taken at MPE-Panter. The HEW of the individual shells will be discussed, in addition to results from the full two shell optic test.

  15. Reactive ion etching of Si(x)Sb2Te in CF4/Ar plasma for nonvolatile phase-change memory device.

    PubMed

    Gu, Yifeng; Song, Sannian; Song, Zhitang; Cheng, Yan; Liu, Xuyan; Du, Xiaofeng; Liu, Bo; Feng, Songlin

    2013-02-01

    Si(x)Sb2Te material system is novel for phase-change random access memory applications. Its properties are more outstanding than the widely used material Ge2Sb2Te5. Etching process is one of the critical steps in the device fabrication. The etching characteristics of phase-change material Si(x)Sb2Te were studied with CF4/Ar gas mixture by a reactive ion etching system. The changes of etching rate, etching profile and surface root-mean-square roughness resulted from variation of the gas-mixing ratio were investigated under constant pressure (50 mTorr) and applying power (200 W). Si0.34Sb2Te is with the highest phase-change speed and the lowest power consumption in the PCRAM memory among these compositions, which means it is the most promising candidate for the PCRAM applications. So the most optimized CF4/Ar gas ratio for Si0.34Sb2Te was studied, the value is 25/25. The etching rate is 155 nm/min, and the selectivity of Si0.34Sb2Te to SiO2 is as high as 3.4 times. Furthermore, the smooth surface was achieved with this optimized gas ratio. PMID:23646688

  16. Color contrast of red blood cells on solid substrate

    NASA Astrophysics Data System (ADS)

    Paiziev, Adkham A.

    2013-02-01

    In present study we developed the new method of colour visualization of red blood cells without using any chemical staining. The method based on physical phenomena a white light interference on thin transparent films. It is shown that in the case of thin human blood smears colour interference contrast occurs on solid polished substrates. The best contrast shows substrates with maximal refractive index (Mo, W, Si). These materials have been selected as substrate instead of ordinary microscopic slide in reflected light microscopy. It is shown that reflection of incident white light from blood cell surface and boundary cell-substrate generate two coherent lights. The second one (object signal) after passing through red blood cell gathers additional phase and after interference interaction with reference signal (light reflected from outer cell surface) enables cell image in colour. Number of blood smears of healthy persons (control) and patients who were diagnosed with cancer are presented. It is concluded that the offered method may be used as an effective diagnostic tool to detect early stage blood cells lesion by its interference painting in white light. Offered method may be used in research laboratories, hospitals, diagnostic centres, emergency medicine and other as complementary diagnostic tool to present convenient optical and electron microscopy technique.

  17. A generic model for creep rupture lifetime estimation on fibrous ceramic composites

    NASA Technical Reports Server (NTRS)

    Chuang, Tze-Jer

    1992-01-01

    Because of their high strength and toughness at elevated temperatures, fiber reinforced ceramic composites such as SiC(f)/SiC and SiC(f)/Si3N4 have become candidates for next-generation turbine engine materials. A generic model is proposed for assessing the lifetime of this class of materials when subjected to long-term creep rupture conditions. This 2D model consists of interfacial cracks growing between square grains and rectangular fibers in the direction normal to the principal tensile stress axis. Neglecting transient effects, the total lifetime is derived based on the criterion that rupture is due to coalescence of adjacent cracks. Lifetime is inversely proportional to crack growth rate, volume fraction, and aspect ratio of the fibers; but extremely sensitive to the applied stress, due to the high power of the V-K(I) law. This lifetime estimation seems to be in fair agreement with the creep rupture data of SiC(w)/Si3N4 composite with 0 and 30 vol percent reinforcement tested at 1250 C in air. TEM performed on the postcrept specimens revealed that creep damage is predominantly in the form of microcracks at matrix/matrix as well as fiber/matrix interfaces, approximately in accord with the model simulation.

  18. Controlled fabrication of nanopores using a direct focused ion beam approach with back face particle detection

    NASA Astrophysics Data System (ADS)

    Patterson, N.; Adams, D. P.; Hodges, V. C.; Vasile, M. J.; Michael, J. R.; Kotula, P. G.

    2008-06-01

    We report a direct, ion drilling technique that enables the reproducible fabrication and placement of nanopores in membranes of different thickness. Using a 30 keV focused Ga ion beam column combined with an in situ, back face, multi-channelplate particle detector, nanopores are sputtered in Si3N4 and W/Si3N4 to have diameters as small as 12 nm. Transmission electron microscopy shows that focused ion beam-drilled holes are near-conical with the diameter decreasing from entry to exit side. By monitoring the detector signal during ion exposure, the drilled hole width can be minimized such that the exit-side diameter is smaller than the full width at half-maximum of the nominally Gaussian-shaped incident beam. Judicious choice of the beam defining aperture combined with back face particle detection allows for reproducible exit-side hole diameters between 18 and 100 nm. The nanopore direct drilling technique does not require potentially damaging broad area exposure to tailor hole sizes. Moreover, this technique successfully achieves breakthrough despite the effects of varying membrane thickness, redeposition, polycrystalline grain structure, and slight ion beam current fluctuations.

  19. Controlled fabrication of nanopores using a direct focused ion beam approach with back face particle detection.

    PubMed

    Patterson, N; Adams, D P; Hodges, V C; Vasile, M J; Michael, J R; Kotula, P G

    2008-06-11

    We report a direct, ion drilling technique that enables the reproducible fabrication and placement of nanopores in membranes of different thickness. Using a 30 keV focused Ga ion beam column combined with an in situ, back face, multi-channelplate particle detector, nanopores are sputtered in Si(3)N(4) and W/Si(3)N(4) to have diameters as small as 12 nm. Transmission electron microscopy shows that focused ion beam-drilled holes are near-conical with the diameter decreasing from entry to exit side. By monitoring the detector signal during ion exposure, the drilled hole width can be minimized such that the exit-side diameter is smaller than the full width at half-maximum of the nominally Gaussian-shaped incident beam. Judicious choice of the beam defining aperture combined with back face particle detection allows for reproducible exit-side hole diameters between 18 and 100 nm. The nanopore direct drilling technique does not require potentially damaging broad area exposure to tailor hole sizes. Moreover, this technique successfully achieves breakthrough despite the effects of varying membrane thickness, redeposition, polycrystalline grain structure, and slight ion beam current fluctuations. PMID:21825787

  20. Recovery of iron and calcium aluminate slag from high-ferrous bauxite by high-temperature reduction and smelting process

    NASA Astrophysics Data System (ADS)

    Zhang, Ying-yi; Lü, Wei; Qi, Yuan-hong; Zou, Zong-shu

    2016-08-01

    A high-temperature reduction and smelting process was used to recover iron and calcium aluminate slag from high-ferrous bauxite. The effects of w(CaO)/ w(SiO2) ratio, anthracite ratio, and reduction temperature and time on the recovery and size of iron nuggets and on the Al2O3 grade of the calcium aluminate slag were investigated through thermodynamic calculations and experiments. The optimized process conditions were the bauxite/anthracite/slaked lime weight ratio of 100:16.17:59.37, reduction temperature of 1450°C and reduction time of 20 min. Under these conditions, high-quality iron nuggets and calcium aluminate slag were obtained. The largest size and the highest recovery rate of iron nuggets were 11.42 mm and 92.79wt%, respectively. The calcium aluminate slag mainly comprised Ca2SiO4 and Ca12Al14O33, with small amounts of FeAl2O4, CaAl2O4, and Ca2Al2SiO7.

  1. Ti/Al/W Ohmic contacts to p-type implanted 4H-SiC

    NASA Astrophysics Data System (ADS)

    Vivona, M.; Greco, G.; Lo Nigro, R.; Bongiorno, C.; Roccaforte, F.

    2015-07-01

    In this work, the morphological, structural, and electrical properties of Ti/Al/W contacts to p-type implanted silicon carbide (4H-SiC) have been monitored as a function of the annealing temperature (800-1100 °C). The increase of the annealing temperature induces a transition from a rectifying to an Ohmic behavior, with a specific contact resistance of 5.8 × 10-4 Ωcm2. The electrical behavior has been correlated with the morphological and structural analyses. In particular, the transition to an Ohmic behavior was accompanied by a gradual increase of the surface roughness and by the occurrence of a reaction leading to the formation of new phases in the stack and at the interface (TiAl3, W(SiAl)2, and TiC). The presence of Al-rich protrusions penetrating in the SiC substrate was also observed. From the temperature dependence of the electrical parameters, a barrier height of 0.69 eV for this system was determined. The thermal stability of the contacts has been demonstrated for long-term (up to 100 h) thermal cycling at 400 °C.

  2. D. C. Plasma-Sprayed Coatings of Nanostructured Alumina-Titania-Silica

    NASA Astrophysics Data System (ADS)

    Jiang, Xian-liang; Liu, Min

    2002-10-01

    Nanocrystalline powders of w(Al2O3) = 95%, w(TiO2) = 3%, and w(SiO2) = 2%, were reprocessed into agglomerated particles for plasma spraying, by using consecutive steps of ball milling, slurry forming, spray drying, and heat treatment. D. C. plasma was used to spray the agglomerated nanocrystalline powders, and resultant coatings were deposited on the substrate of stainless steel. Scanning electron microscopy (SEM) was used to examine the morphology of the agglomerated powders and the cross section of the alumina-titania-silica coatings. Experimental results show that the agglomerated noncrystalline particles are spherical, with a size from (10-90) μm. The flow ability of the nanocrystalline powders is greatly improved after the reprocessing. The coatings deposited by the plasma spraying are mainly of nanostructure. Unlike conventional plasma-sprayed coatings, no laminar layer could be found in the nanostructured coatings. Although the nanostructured coatings have a lower microhardness than conventional microstructured coatings, the toughness of the nanostructured ceramic coatings is significantly improved.

  3. Mechanical Properties and Durability of "Waterless Concrete"

    NASA Technical Reports Server (NTRS)

    Toutanji, Houssam; Grugel, Richard N.

    2008-01-01

    Waterless concrete consists of molten elementary sulfur and aggregate. The aggregates in lunar environment will be lunar rocks and soil. Sulfur is present on the Moon in Troilite soil (FeS) and by oxidation soil iron and sulfur can be produced. Iron can be used to reinforce the sulfur concrete. Sulfur concrete specimens were cycled between liquid nitrogen (approximately 191 C) and room temperature (approximately 21 C) to simulate exposure to a lunar environment. Cycled and control specimens were subsequently tested in compression at room temperatures (approximately 21 C) and approximately 101 C. Test results showed that due to temperature cycling, compressive strength of cycled specimens was 20% of those non-cycled. Microscopic examination of the fracture surfaces from the cycled samples showed clear de-bonding of the sulfur from the aggregate material whereas it was seen well bonded in those non-cycled. This reduction in strength can be attributed to the large differences in thermal coefficients of expansion of the materials constituting the concrete which promoted cracking. Similar sulfur concrete mixtures were strengthened with short and long glass fibers. The glass fibers from lunar regolith simulant was melted in a 25 cc Pt-Rh crucible in a Sybron Thermoline high temperature MoSi2 furnace at melting temperatures of 1450 to 1600 C for times of 30 min to 1 hour. Glass fibers were cast from the melt into graphite crucibles and were annealed for a couple of hours at 600 C. Glass fibers and small rods were pulled from the melt. The glass melt wets the ceramic rod and long continuous glass fibers were easily hand drawn. The glass fibers were immediately coated with a protective polymer to maintain the mechanical strength. The glass fibers were used to reinforce sulfur concrete plated to improve the flexural strength of the sulfur concrete. Prisms beams strengthened with glass fibers were tested in 4-point bending test. Beams strengthened with glass fiber showed to

  4. First-principles calculation of defect free energies: General aspects illustrated in the case of bcc Fe

    NASA Astrophysics Data System (ADS)

    Murali, D.; Posselt, M.; Schiwarth, M.

    2015-08-01

    Modeling of nanostructure evolution in solids requires comprehensive data on the properties of defects such as the vacancy and foreign atoms. Since most processes occur at elevated temperatures, not only the energetics of defects in the ground state, but also their temperature-dependent free energies must be known. The first-principles calculation of contributions of phonon and electron excitations to free formation, binding, and migration energies of defects is illustrated in the case of bcc Fe. First of all, the ground-state properties of the vacancy, the foreign atoms Cu, Y, Ti, Cr, Mn, Ni, V, Mo, Si, Al, Co, O, and the O-vacancy pair are determined under constant volume (CV) as well as zero-pressure (ZP) conditions, and relations between the results of both kinds of calculations are discussed. Second, the phonon contribution to defect free energies is calculated within the harmonic approximation using the equilibrium atomic positions determined in the ground state under CV and ZP conditions. In most cases, the ZP-based free formation energy decreases monotonously with temperature, whereas for CV-based data both an increase and a decrease were found. The application of a quasiharmonic correction to the ZP-based data does not modify this picture significantly. However, the corrected data are valid under zero-pressure conditions at higher temperatures than in the framework of the purely harmonic approach. The difference between CV- and ZP-based data is mainly due to the volume change of the supercell since the relative arrangement of atoms in the environment of the defects is nearly identical in the two cases. A simple transformation similar to the quasiharmonic approach is found between the CV- and ZP-based frequencies. Therefore, it is not necessary to calculate these quantities and the corresponding defect free energies separately. In contrast to ground-state energetics, the CV- and ZP-based defect free energies do not become equal with increasing supercell

  5. Generality of the 18-n Rule: Intermetallic Structural Chemistry Explained through Isolobal Analogies to Transition Metal Complexes.

    PubMed

    Yannello, Vincent J; Fredrickson, Daniel C

    2015-12-01

    Intermetallic phases exhibit a vast structural diversity in which electron count is known to be one controlling factor. However, chemical bonding theory has yet to establish how electron counts and structure are interrelated for the majority of these compounds. Recently, a simple bonding picture for transition metal (T)-main group (E) intermetallics has begun to take shape based on isolobal analogies to molecular T complexes. This bonding picture is summarized in the 18-n rule: each T atom in a T-E intermetallic phase will need 18-n electrons to achieve a closed-shell 18-electron configuration, where n is the number of electron pairs it shares with other T atoms in multicenter interactions isolobal to T-T bonds. In this Article, we illustrate the generality of this rule with a survey over a wide range of T-E phases. First, we illustrate how three structural progressions with changing electron counts can be accounted for, both geometrically and electronically, with the 18-n rule: (1) the transition between the fluorite and complex β-FeSi2 types for TSi2 phases; (2) the sequence from the marcasite type to the arsenopyrite type and back to the marcasite type for TSb2 compounds; and (3) the evolution from the AuCu3 type to the ZrAl3 and TiAl3 types for TAl3 phases. We then turn to a broader survey of the applicability of the 18-n rule through a study of the following 34 binary structure types: PtHg4, CaF2 (fluorite), Fe3C, CoGa3, Co2Al5, Ru2B3, β-FeSi2, NiAs, Ni2Al3, Rh4Si5, CrSi2, Ir3Ga5, Mo3Al8, MnP, TiSi2, Ru2Sn3, TiAl3, MoSi2, CoSn, ZrAl3, CsCl, FeSi, AuCu3, ZrSi2, Mn2Hg5, FeS2 (oP6, marcasite), CoAs3 (skutterudite), PdSn2, CoSb2, Ir3Ge7, CuAl2, Re3Ge7, CrP2, and Mg2Ni. Through these analyses, the 18-n rule is established as a framework for interpreting the stability of 341 intermetallic phases and anticipating their properties. PMID:26581113

  6. Combinatorial Reactive Sputtering of In2S3 as an Alternative Contact Layer for Thin Film Solar Cells.

    PubMed

    Siol, Sebastian; Dhakal, Tara P; Gudavalli, Ganesh S; Rajbhandari, Pravakar P; DeHart, Clay; Baranowski, Lauryn L; Zakutayev, Andriy

    2016-06-01

    High-throughput computational and experimental techniques have been used in the past to accelerate the discovery of new promising solar cell materials. An important part of the development of novel thin film solar cell technologies, that is still considered a bottleneck for both theory and experiment, is the search for alternative interfacial contact (buffer) layers. The research and development of contact materials is difficult due to the inherent complexity that arises from its interactions at the interface with the absorber. A promising alternative to the commonly used CdS buffer layer in thin film solar cells that contain absorbers with lower electron affinity can be found in β-In2S3. However, the synthesis conditions for the sputter deposition of this material are not well-established. Here, In2S3 is investigated as a solar cell contact material utilizing a high-throughput combinatorial screening of the temperature-flux parameter space, followed by a number of spatially resolved characterization techniques. It is demonstrated that, by tuning the sulfur partial pressure, phase pure β-In2S3 could be deposited using a broad range of substrate temperatures between 500 °C and ambient temperature. Combinatorial photovoltaic device libraries with Al/ZnO/In2S3/Cu2ZnSnS4/Mo/SiO2 structure were built at optimal processing conditions to investigate the feasibility of the sputtered In2S3 buffer layers and of an accelerated optimization of the device structure. The performance of the resulting In2S3/Cu2ZnSnS4 photovoltaic devices is on par with CdS/Cu2ZnSnS4 reference solar cells with similar values for short circuit currents and open circuit voltages, despite the overall quite low efficiency of the devices (∼2%). Overall, these results demonstrate how a high-throughput experimental approach can be used to accelerate the development of contact materials and facilitate the optimization of thin film solar cell devices. PMID:27173477

  7. Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography

    SciTech Connect

    Cardinale, G. F.; Henderson, C. C.; Goldsmith, J. E. M.; Mangat, P. J. S.; Cobb, J.; Hector, S. D.

    1999-11-01

    In two separate experiments, we have successfully demonstrated the transfer of dense- and loose-pitch line/space (L/S) photoresist features, patterned with extreme ultraviolet (EUV) lithography, into an underlying hard mask material. In both experiments, a deep-UV photoresist ({approx}90 nm thick) was spin cast in bilayer format onto a hard mask (50-90 nm thick) and was subsequently exposed to EUV radiation using a 10x reduction EUV exposure system. The EUV reticle was fabricated at Motorola (Tempe, AZ) using a subtractive process with Ta-based absorbers on Mo/Si multilayer mask blanks. In the first set of experiments, following the EUV exposures, the L/S patterns were transferred first into a SiO{sub 2} hard mask (60 nm thick) using a reactive ion etch (RIE), and then into polysilicon (350 nm thick) using a triode-coupled plasma RIE etcher at the University of California, Berkeley, microfabrication facilities. The latter etch process, which produced steep (>85 degree sign ) sidewalls, employed a HBr/Cl chemistry with a large (>10:1) etch selectivity of polysilicon to silicon dioxide. In the second set of experiments, hard mask films of SiON (50 nm thick) and SiO{sub 2} (87 nm thick) were used. A RIE was performed at Motorola using a halogen gas chemistry that resulted in a hard mask-to-photoresist etch selectivity >3:1 and sidewall profile angles {>=}85 degree sign . Line edge roughness (LER) and linewidth critical dimension (CD) measurements were performed using Sandia's GORA(c) CD digital image analysis software. Low LER values (6-9 nm, 3{sigma}, one side) and good CD linearity (better than 10%) were demonstrated for the final pattern-transferred dense polysilicon L/S features from 80 to 175 nm. In addition, pattern transfer (into polysilicon) of loose-pitch (1:2) L/S features with CDs{>=}60 nm was demonstrated. (c) 1999 American Vacuum Society.

  8. Electron Microscopy Studies of Solid Surfaces and Interfaces.

    NASA Astrophysics Data System (ADS)

    Gajdardziska-Josifovska, Marija

    1991-02-01

    Electron microscopy techniques for study of surfaces and interfaces have been investigated and applied to (100) and (111) surfaces of MgO and to interfaces of Mo/Si multilayers and CoSi_2/Si epitaxial films. MgO surfaces subjected to different annealing and chemical treatments have been characterized by reflection electron microscopy imaging, reflection high-energy electron diffraction (RHEED), and reflection electron energy-loss spectroscopy (REELS). An oxygen rich (sqrt {3} times sqrt{3})R 30^circ reconstruction was found on the polar (111) surface upon annealing in oxygen at temperatures higher than 1500 ^circC. Transformation of the surface topography and segregation of calcium were observed on the cleaved (100) surface due to annealing. RHEED resonance conditions have been employed and studied with geometrical constructions, rocking curves and REELS. These conditions are associated with parabolas in the Kikuchi (K) patterns whose nature had been subject of much controversy. The parabolas have been explained as K lines of two-dimensional (2D) lattices in a general scheme which describes the K pattern geometry in terms of intersections of Brillouin zone boundaries with a sphere of reflections. Full treatment of the cases of 2D and 1D real lattices has revealed previously unknown boundaries in the form of parabolic surfaces (2D) and paraboloids of revolution (1D). These boundaries have been applied to lines which arise from electron channeling in 3D crystals and to RHEED parabolas from 2D surface reconstructions. Nanodiffraction, low angle dark-field imaging, electron holography, high spatial resolution EELS, and shadow imaging have been evaluated as means for measuring interface abruptness and change in mean-inner potential and compared to other microscopy techniques. Refraction effects at interfaces were observed as streaking of the nanodiffraction disks which was found to depend on the crystalline nature of the interface. For polycrystalline

  9. Nanocomposite metal amorphous-carbon thin films deposited by hybrid PVD and PECVD technique.

    PubMed

    Teixeira, V; Soares, P; Martins, A J; Carneiro, J; Cerqueira, F

    2009-07-01

    Carbon based films can combine the properties of solid lubricating graphite structure and hard diamond crystal structure, i.e., high hardness, chemical inertness, high thermal conductivity and optical transparency without the crystalline structure of diamond. Issues of fundamental importance associated with nanocarbon coatings are reducing stress, improving adhesion and compatibility with substrates. In this work new nanocomposite coatings with improved toughness based in nanocrystalline phases of metals and ceramics embedded in amorphous carbon matrix are being developed within the frame of a research project: nc-MeNxCy/a-C(Me) with Me = Mo, Si, Al, Ti, etc. Carbide forming metal/carbon (Me/C) composite films with Me = Mo, W or Ti possess appropriate properties to overcome the limitation of pure DLC films. These novel coating architectures will be adopted with the objective to decrease residual stress, improve adherence and fracture toughness, obtain low friction coefficient and high wear-resistance. Nanocomposite DLC's films were deposited by hybrid technique using a PVD-Physically Vapor Deposition (magnetron sputtering) and Plasma Enhanced Chemical Vapor Deposition (PECVD), by the use of CH4 gas. The parameters varied were: deposition time, substrate temperature (180 degrees C) and dopant (Si + Mo) of the amorphous carbon matrix. All the depositions were made on silicon wafers and steel substrates precoated with a silicon inter-layer. The characterisation of the film's physico-mechanical properties will be presented in order to understand the influence of the deposition parameters and metal content used within the a-C matrix in the thin film properties. Film microstructure and film hybridization state was characterized by Raman Spectroscopy. In order to characterize morphology SEM and AFM will be used. Film composition was measured by Energy-Dispersive X-ray analysis (EDS) and by X-ray photoelectron spectroscopy (XPS). The contact angle for the produced DLC's on

  10. Nanocomposites for high-speed optical modulators and plasmonic thermal mid-infrared emitters

    NASA Astrophysics Data System (ADS)

    Demir, Veysi

    Demand for high-speed optical modulators and narrow-bandwidth infrared thermal emitters for numerous applications continues to rise and new optical devices are needed to deal with massive data flows, processing powers, and fabrication costs. Conventional techniques are usually hindered by material limitations or electronic interconnects and advances in organic nanocomposite materials and their integration into photonic integrated circuits (PICs) have been acknowledged as a promising alternative to single crystal techniques. The work presented in this thesis uses plasmonic and magneto-optic effects towards the development of novel optical devices for harnessing light and generating high bandwidth signals (>40GHz) at room and cryogenic temperatures (4.2°K). Several publications have resulted from these efforts and are listed at the end of the abstract. In our first published research we developed a narrow-bandwidth mid-infrared thermal emitter using an Ag/dielectric/Ag thin film structure arranged in hexagonal planar lattice structures. PECVD produced nanoamorphous carbon (NAC) is used as a dielectric layer. Spectrally tunable (>2 mum) and narrow bandwidth (<0.5 mum) emission peaks in the range of 4-7 mum were demonstrated by decreasing the resistivity of NAC from 1012 and 109 O.cm with an MoSi2 dopant and increasing the emitter lattice constant from 4 to 7 mum. This technique offers excellent flexibility for developing cost-effective mid-IR sources as compared to costly fiber and quantum cascade lasers (QCLs). Next, the effect of temperature on the Verdet constant for cobalt-ferrite polymer nanocomposites was measured for a series of temperatures ranging from 40 to 200°K with a Faraday rotation polarimeter. No visual change was observed in the films during thermal cycling, and ˜4x improvement was achieved at 40°K. The results are promising and further analysis is merited at 4.2°K to assess the performance of this material for cryogenic magneto-optic modulators

  11. EUV mask multilayer defects and their printability under different multilayer deposition conditions

    NASA Astrophysics Data System (ADS)

    Kwon, Hyuk Joo; Harris-Jones, Jenah; Cordes, Aaron; Satake, Masaki; Li, Ying; Mochi, Iacopo; Goldberg, Kenneth A.

    2012-03-01

    Extreme ultraviolet (EUV) patterning appears feasible using currently available EUV exposure tools, but some issues must still be resolved for EUV patterning to be used in production. Defects in EUV mask blanks are one such major issue and inspection tools are needed to detect phase defects on EUV mask blanks that could possibly print on the wafer. Currently available inspection tools can capture defects on the mask, but they also need to be able to classify possible printable defects. Defect classification for repair and mitigation of printable defects is very difficult using deep ultraviolet (DUV) inspection tools; however, if the actinic inspection tool (AIT) could gather defect information from more multilayer (ML) stacks, it may be able to separate printable defects from unprintable defects. If unprintable defects could be eliminated, the defect information could be used for mask pattern shifts to reduce printable defects. Fewer defects would need to be repaired if there were a better chance of capturing printable defects using an actinic inspection tool. Being able to detect printable defects on EUV blanks is therefore critical in mask making. In this paper, we describe the characterization of programmed ML phase defects in the manufacturing of EUV mask blanks using the state-of-the-art mask metrology equipment in SEMATECH's Mask Blank Development Center (MBDC). Programmed defects of various dimensions were prepared using e-beam patterning technology and Mo/Si MLs were deposited with SEMATECH's best known method (BKM) and pit smoothing conditions on programmed defects to characterize ML phase defects. Atomic force microscopy (AFM) and transmission electron microscopy (TEM) were used to study ML profile changes, while SEMATECH's AIT was used to image ML phase defects and predict their printability. Multilayer defect reconstruction (MDR) was done using AFM images, which were then compared to TEM images. Defect printability simulation (DPS) was used for

  12. Smoothing of substrate pits using ion beam deposition for EUV lithography

    NASA Astrophysics Data System (ADS)

    Harris-Jones, Jenah; Jindal, Vibhu; Kearney, Patrick; Teki, Ranganath; John, Arun; Kwon, Hyuk Joo

    2012-03-01

    Mitigation of pit-type defects proves to be a major hurdle facing the production of a defect-free mask blank for EUV lithography. Recent efforts have been directed toward substrate smoothing methods during deposition. The angle of incidence of the substrate is known to have a significant effect on the growth of defects during deposition. It has been shown that shadowing effects for bump-type defects are reduced when depositing Mo/Si films at near-normal incidence, resulting in a Gaussian growth profile in which the height and volume of the defect are minimized. Conversely, operating at off-normal incidence reduces shadowing of pit-type defects. When altering the angle of incidence of the substrate, the target angle must be changed to maintain uniformity. The resulting mask blank must also meet surface roughness specifications post-deposition while maintaining a low defect density. In this study, various substrate angle and target angle combinations were investigated within the Veeco Nexus Low Defect Density tool at SEMATECH to find optimum in situ pit smoothing conditions using ion beam deposition on both quartz and low thermal expansion material (LTEM) substrates. The possible substrate-target angle combinations are limited by the design of the current deposition tool; therefore, a phase space has been mapped out to determine uniform and non-uniform regions. Other deposition parameters including operating pressure and working gas composition were also explored. After deposition, EUV reflectrometry measurements were taken to evaluate uniformity in the wavelength; surface roughness, change in pit depth, change in full width at half maximum, and pit smoothing power were determined using atomic force microscopy (AFM); transmission electron microscopy (TEM) was used to study the effect of film disruption through the multilayer; and the printability of smoothed pits will be measure actinically using SEMATECH's AIT tool. Preliminary results show that positive values for

  13. Benchmarking ENDF/B-VII.1, JENDL-4.0 and JEFF-3.1.1 with MCNP6

    NASA Astrophysics Data System (ADS)

    van der Marck, Steven C.

    2012-12-01

    Recent releases of three major world nuclear reaction data libraries, ENDF/B-VII.1, JENDL-4.0, and JEFF-3.1.1, have been tested extensively using benchmark calculations. The calculations were performed with the latest release of the continuous energy Monte Carlo neutronics code MCNP, i.e. MCNP6. Three types of benchmarks were used, viz. criticality safety benchmarks, (fusion) shielding benchmarks, and reference systems for which the effective delayed neutron fraction is reported. For criticality safety, more than 2000 benchmarks from the International Handbook of Criticality Safety Benchmark Experiments were used. Benchmarks from all categories were used, ranging from low-enriched uranium, compound fuel, thermal spectrum ones (LEU-COMP-THERM), to mixed uranium-plutonium, metallic fuel, fast spectrum ones (MIX-MET-FAST). For fusion shielding many benchmarks were based on IAEA specifications for the Oktavian experiments (for Al, Co, Cr, Cu, LiF, Mn, Mo, Si, Ti, W, Zr), Fusion Neutronics Source in Japan (for Be, C, N, O, Fe, Pb), and Pulsed Sphere experiments at Lawrence Livermore National Laboratory (for 6Li, 7Li, Be, C, N, O, Mg, Al, Ti, Fe, Pb, D2O, H2O, concrete, polyethylene and teflon). The new functionality in MCNP6 to calculate the effective delayed neutron fraction was tested by comparison with more than thirty measurements in widely varying systems. Among these were measurements in the Tank Critical Assembly (TCA in Japan) and IPEN/MB-01 (Brazil), both with a thermal spectrum, two cores in Masurca (France) and three cores in the Fast Critical Assembly (FCA, Japan), all with fast spectra. The performance of the three libraries, in combination with MCNP6, is shown to be good. The results for the LEU-COMP-THERM category are on average very close to the benchmark value. Also for most other categories the results are satisfactory. Deviations from the benchmark values do occur in certain benchmark series, or in isolated cases within benchmark series. Such

  14. Nikon EUVL development progress update

    NASA Astrophysics Data System (ADS)

    Miura, Takaharu; Murakami, Katsuhiko; Suzuki, Kazuaki; Kohama, Yoshiaki; Morita, Kenji; Hada, Kazunari; Ohkubo, Yukiharu; Kawai, Hidemi

    2008-03-01

    Extreme Ultra Violet Lithography (EUVL) has been widely regarded as the lithography technology to succeed optical lithography. It is now considered as one of the most promising technologies below hp45nm node [1], following ArF immersion lithography considering trend of achievable process K1 factors. In this paper we would like to present our significant progress on the development of EUV exposure tool. There are several key important areas which should be developed to realize EUVL to be feasible, such as reflective mask, resist, and tool itself. The reflective mask features such characteristics as pellicle-less, ultra-smooth blank flatness and defect free. The resist should be of high sensitivity and small line edge roughness (LER) as well as fine resolution. EUV exposure tool itself consists of major modules such as EUV light source, projection optics, vacuum body, vacuum stages, and so on. Nikon has developed new polishing technologies such as ion-beam figuring and elastic emission machining, and new ultra high-precision interferometers for aspheric surface metrology. Our multi-layer coating technology has been also improved. High reflective Mo/Si multi layer coating has been successfully achieved and irradiation tests using synchrotron radiation have been conducted. Successful achievement of those developments enables us to produce full-field projection optics for EUVL process development tool called EUV1. The proto-type development of full-field projection optics has been successfully completed and its technical achievement has reflected into production optics. Preparation of complete set of production and metrology tools necessary for projection optics production was completed and all tools are now in full operation. Nikon has already developed dual pod reticle carrier for EUV1 tool. In parallel Nikon has been developing the same concept carrier for HVM in cooperation with Canon and Entegris. Regarding to EUV1 tool development, all modules of EUV1 such as full

  15. Evaluation of measurement uncertainties in EUV scatterometry

    NASA Astrophysics Data System (ADS)

    Gross, H.; Scholze, F.; Rathsfeld, A.; Bär, M.

    2009-06-01

    reconstruction algorithm. The input data of the reconstruction are very complex, i.e., they consists not only of the measured efficiencies, but furthermore of fixed and presumed model parameters such as the widths of the layers in the Mo/Si multilayer mirror beneath the line-space structure. Beside the impact of the uncertainties on the measured efficiencies, we analyze the influence of deviations in the thickness and periodicity of the multilayer stack on the measurement uncertainties of the critical dimensions.

  16. Generation of short and intense attosecond pulses

    NASA Astrophysics Data System (ADS)

    Khan, Sabih Ud Din

    Extremely broad bandwidth attosecond pulses (which can support 16as pulses) have been demonstrated in our lab based on spectral measurements, however, compensation of intrinsic chirp and their characterization has been a major bottleneck. In this work, we developed an attosecond streak camera using a multi-layer Mo/Si mirror (bandwidth can support ˜100as pulses) and position sensitive time-of-flight detector, and the shortest measured pulse was 107.5as using DOG, which is close to the mirror bandwidth. We also developed a PCGPA based FROG-CRAB algorithm to characterize such short pulses, however, it uses the central momentum approximation and cannot be used for ultra-broad bandwidth pulses. To facilitate the characterization of such pulses, we developed PROOF using Fourier filtering and an evolutionary algorithm. We have demonstrated the characterization of pulses with a bandwidth corresponding to ˜20as using synthetic data. We also for the first time demonstrated single attosecond pulses (SAP) generated using GDOG with a narrow gate width from a multi-cycle driving laser without CE-phase lock, which opens the possibility of scaling attosecond photon flux by extending the technique to peta-watt class lasers. Further, we generated intense attosecond pulse trains (APT) from laser ablated carbon plasmas and demonstrated ˜9.5 times more intense pulses as compared to those from argon gas and for the first time demonstrated a broad continuum from a carbon plasma using DOG. Additionally, we demonstrated ˜100 times enhancement in APT from gases by switching to 400 nm (blue) driving pulses instead of 800 nm (red) pulses. We measured the ellipticity dependence of high harmonics from blue pulses in argon, neon and helium, and developed a simple theoretical model to numerically calculate the ellipticity dependence with good agreement with experiments. Based on the ellipticity dependence, we proposed a new scheme of blue GDOG which we predict can be employed to extract

  17. Benchmarking ENDF/B-VII.1, JENDL-4.0 and JEFF-3.1.1 with MCNP6

    SciTech Connect

    Marck, Steven C. van der

    2012-12-15

    Recent releases of three major world nuclear reaction data libraries, ENDF/B-VII.1, JENDL-4.0, and JEFF-3.1.1, have been tested extensively using benchmark calculations. The calculations were performed with the latest release of the continuous energy Monte Carlo neutronics code MCNP, i.e. MCNP6. Three types of benchmarks were used, viz. criticality safety benchmarks, (fusion) shielding benchmarks, and reference systems for which the effective delayed neutron fraction is reported. For criticality safety, more than 2000 benchmarks from the International Handbook of Criticality Safety Benchmark Experiments were used. Benchmarks from all categories were used, ranging from low-enriched uranium, compound fuel, thermal spectrum ones (LEU-COMP-THERM), to mixed uranium-plutonium, metallic fuel, fast spectrum ones (MIX-MET-FAST). For fusion shielding many benchmarks were based on IAEA specifications for the Oktavian experiments (for Al, Co, Cr, Cu, LiF, Mn, Mo, Si, Ti, W, Zr), Fusion Neutronics Source in Japan (for Be, C, N, O, Fe, Pb), and Pulsed Sphere experiments at Lawrence Livermore National Laboratory (for {sup 6}Li, {sup 7}Li, Be, C, N, O, Mg, Al, Ti, Fe, Pb, D2O, H2O, concrete, polyethylene and teflon). The new functionality in MCNP6 to calculate the effective delayed neutron fraction was tested by comparison with more than thirty measurements in widely varying systems. Among these were measurements in the Tank Critical Assembly (TCA in Japan) and IPEN/MB-01 (Brazil), both with a thermal spectrum, two cores in Masurca (France) and three cores in the Fast Critical Assembly (FCA, Japan), all with fast spectra. The performance of the three libraries, in combination with MCNP6, is shown to be good. The results for the LEU-COMP-THERM category are on average very close to the benchmark value. Also for most other categories the results are satisfactory. Deviations from the benchmark values do occur in certain benchmark series, or in isolated cases within benchmark series

  18. Letter Report Documenting Progress of Second Generation ATF FeCrAl Alloy Fabrication

    SciTech Connect

    Yamamoto, Y.; Yang, Y.; Field, K. G.; Terrani, K.; Pint, B. A.; Snead, L. L.

    2014-06-10

    Development of the 2nd generation ATF FeCrAl alloy has been initiated, and a candidate alloy was selected for trial tube fabrication through hot-extrusion and gun-drilling processes. Four alloys based on Fe-13Cr-4.5Al-0.15Y in weight percent were newly cast with minor alloying additions of Mo, Si, Nb, and C to promote solid-solution and second-phase precipitate strengthening. The alloy compositions were selected with guidance from computational thermodynamic tools. The lab-scale heats of ~ 600g were arc-melted and drop-cast, homogenized, hot-forged and -rolled, and then annealed producing plate shape samples. An alloy with Mo and Nb additions (C35MN) processed at 800°C exhibits very fine sub-grain structure with the sub-grain size of 1-3μm which exhibited more than 25% better yield and tensile strengths together with decent ductility compared to the other FeCrAl alloys at room temperature. It was found that the Nb addition was key to improving thermal stability of the fine sub-grain structure. Optimally, grains of less than 30 microns are desired, with grains up to and order of magnitude in desired produced through Nb addition. Scale-up effort of the C35MN alloy was made in collaboration with a commercial cast company who has a capability of vacuum induction melting. A 39lb columnar ingot with ~81mm diameter and ~305mm height (with hot-top) was commercially cast, homogenized, hot-extruded, and annealed providing 10mm-diameter bar-shape samples with the fine sub-grain structure. This commercial heat proved consistent with materials produced at ORNL at the lab-scale. Tubes and end caps were machined from the bar sample and provided to another work package for the ATF-1 irradiation campaign in the milestone M3FT-14OR0202251.

  19. Provenance and fate of arsenic and other solutes in the Chaco-Pampean Plain of the Andean foreland, Argentina: From perspectives of hydrogeochemical modeling and regional tectonic setting

    NASA Astrophysics Data System (ADS)

    Raychowdhury, Nilasree; Mukherjee, Abhijit; Bhattacharya, Prosun; Johannesson, Karen; Bundschuh, Jochen; Sifuentes, Gabriela Bejarano; Nordberg, Erika; Martin, Raúl A.; Storniolo, Angel del Rosario

    2014-10-01

    Extensive arsenic (As) enriched groundwater is known to occur in the aquifers of the Chaco-Pampean Plain of Argentina. Previous studies speculated that the As mobilization in these groundwaters was a direct result of their elevated pH and oxidative conditions. The volcanic glass layers present in the aquifer matrix were hypothesized as one of the possible sources of As to the groundwaters. Here, we examine the groundwater chemistry of the Santiago del Estero province of Chaco-Pampean Plains of Argentina, and test these hypotheses by using hydrogeochemical modeling within the framework of the regional geologic-tectonic setting. The study area is located in the active foreland of the Andean orogenic belt, which forms a continental arc setting, and is dotted with several hot springs. Rhyolitic volcanic glass fragments derived from arc volcanism are abundant within the aeolian-fluvial aquifer sediments, and are related to the paleo-igneous extrusion in the vicinity. Hydrogeochemical analyses show that the groundwater is in predominantly oxidative condition. In addition, some of the groundwaters exhibit very high Na, Cl- and SO42- concentrations. It is hypothesized in this study that the groundwater chemistry has largely evolved by dissolution of rhyolitic volcanic glass fragments contained within the aquifer sediments along with mixing with saline surface waters from, adjoining salinas, which are thought to be partially evaporated remnants of a paleo inland sea. Flow path modeling, stability diagrams, and thermodynamic analyses undertaken in this study indicate that the dominant evolutionary processes include ion exchange reactions, chemical weathering of silicate and evaporites, in monosialitization-dominated weathering. Geochemical modeling predicts that plagioclase feldspar and volcanic glass are the major solids phases that contribute metal cations and dissolved silica to the local groundwaters. Co-influxed oxyanions, with similar ionic radii and structure (e.g. Mo

  20. Key issues in automatic classification of defects in post-inspection review process of photomasks

    NASA Astrophysics Data System (ADS)

    Pereira, Mark; Maji, Manabendra; Pai, Ravi R.; B. V. R., Samir; Seshadri, R.; Patil, Pradeepkumar

    2012-11-01

    The mask inspection and defect classification is a crucial part of mask preparation technology and consumes a significant amount of mask preparation time. As the patterns on a mask become smaller and more complex, the need for a highly precise mask inspection system with high detection sensitivity becomes greater. However, due to the high sensitivity, in addition to the detection of smaller defects on finer geometries, the inspection machine could report large number of false defects. The total number of defects becomes significantly high and the manual classification of these defects, where the operator should review each of the defects and classify them, may take huge amount of time. Apart from false defects, many of the very small real defects may not print on the wafer and user needs to spend time on classifying them as well. Also, sometimes, manual classification done by different operators may not be consistent. So, need for an automatic, consistent and fast classification tool becomes more acute in more advanced nodes. Automatic Defect Classification tool (NxADC) which is in advanced stage of development as part of NxDAT1, can automatically classify defects accurately and consistently in very less amount of time, compared to a human operator. Amongst the prospective defects as detected by the Mask Inspection System, NxADC identifies several types of false defects such as false defects due to registration error, false defects due to problems with CCD, noise, etc. It is also able to automatically classify real defects such as, pin-dot, pin-hole, clear extension, multiple-edges opaque, missing chrome, chrome-over-MoSi, etc. We faced a large set of algorithmic challenges during the course of the development of our NxADC tool. These include selecting the appropriate image alignment algorithm to detect registration errors (especially when there are sub-pixel registration errors or misalignment in repetitive patterns such as line space), differentiating noise from