It was found that the esters of polystyrene and cinnamic acid , polyvinyl alcohol, and cinnamic acid have high dielectric characteristics that change...Photosensitive acid -resisting emulsions for use in photoengraving of semiconductor parts and semiconductor surfaces were synthesized and tested...organosilicon compounds, cinnamic aldehyde, emulsions based on azo and diazo compounds and polymeric polyesters--were tested. The photoengraving method