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Sample records for pemercepat elektron mbe

  1. Pulser development for MBE-4

    SciTech Connect

    Gough, D.E.; Brodzik, D.A.

    1986-06-01

    The Multiple Beam Experiment MBE4 is designed to accelerate four cesium ion beams from 200 kV to about 1 MV using an induction linac and to demonstrate the process of current amplification simultaneously with acceleration. The injected beam is obtained from a source using a Marx generator providing typically 10 mA/beam with a length of 1.6 meters. This is equivalent to a beam duration time of about 3 ..mu..sec. Twenty four acceleration gaps in groups of four are distributed along the length of the machine which will be some 16 meters long when completed. Each group of four acceleration gaps with appropriate quadrupoles form one section of the machine, identified as A through F. Careful tailoring of the acceleration voltage waveforms at each gap is required to accelerate the beam, amplify the current and provide longitudinal focusing. Ideal voltage waveforms for each gap were generated for a gap voltage limit initially set at 30 kV. These waveforms are shown in Fig. 1. The waveforms for the first 4 gaps are triangular with an approximate width of 3 ..mu..sec, becoming flatter and shorter at subsequent gaps as the beam bunch velocity increases. Ninety two nickel-iron tape wound cores capable of 6.8 mVsec/core and twenty six silicon steel tape wound cores capable of 24 mVsec/core were available. Groups of cores at the first eight gaps have been used in conjunction with an appropriate number of pulsers to provide the necessary accelerating voltage waveforms together with the pulser waveforms at every fourth acceleration gap which provides the longitudinal focusing of the beam. This paper will deal with the performance of the pulsers for the first eight gaps of acceleration and expectations for the next four, currently under construction.

  2. [Russian oxygen generation system "Elektron-VM": hydrogen content in electrolytically produced oxygen for breathing by International Space Station crews].

    PubMed

    Proshkin, V Yu; Kurmazenko, E A

    2014-01-01

    The article presents the particulars of hydrogen content in electrolysis oxygen produced aboard the ISS Russian segment by oxygen generator "Elektron-VM" (SGK) for crew breathing. Hydrogen content was estimated as in the course of SGK operation in the ISS RS, so during the ground life tests. According to the investigation of hydrogen sources, the primary path of H2 appearance in oxygen is its diffusion through the porous diaphragm separating the electrolytic-cell cathode and anode chambers. Effectiveness of hydrogen oxidation in the SGK reheating unit was evaluated. PMID:25035898

  3. MBE HgCdTe heterostructure detectors

    NASA Technical Reports Server (NTRS)

    Schulman, Joel N.; Wu, Owen K.

    1990-01-01

    HgCdTe has been the mainstay for medium (3 to 5 micron) and long (10 to 14 micron) wavelength infrared detectors in recent years. Conventional growth and processing techniques are continuing to improve the material. However, the additional ability to tailor composition and placement of doped layers on the tens of angstroms scale using molecular beam epitaxy (MBE) provides the opportunity for new device physics and concepts to be utilized. MBE-based device structures to be discussed here can be grouped into two categories: tailored conventional structures and quantum structures. The tailored conventional structures are improvements on familiar devices, but make use of the ability to create layers of varying composition, and thus band gap, at will. The heterostructure junction can be positioned independently of doping p-n junctions. This allows the small band gap region in which the absorption occurs to be separated from a larger band gap region in which the electric field is large and where unwanted tunneling can occur. Data from hybrid MBE/liquid phase epitaxy (LPE)/bulk structures are given. Quantum structures include the HgTe-CdTe superlattice, in which the band gap and transport can be controlled by alternating thin layers (tens of angstroms thick) of HgTe and CdTe. The superlattice has been shown to exhibit behavior which is non-alloy like, including very high hole mobilities, two-dimensional structure in the absorption coefficient, resonant tunneling, and anisotropic transport.

  4. Fabrication of photovoltaic laser energy converterby MBE

    NASA Technical Reports Server (NTRS)

    Lu, Hamilton; Wang, Scott; Chan, W. S.

    1993-01-01

    A laser-energy converter, fabricated by molecular beam epitaxy (MBE), was developed. This converter is a stack of vertical p-n junctions connected in series by low-resistivity, lattice matched CoSi2 layers to achieve a high conversion efficiency. Special high-temperature electron-beam (e-beam) sources were developed especially for the MBE growth of the junctions and CoSi2 layers. Making use of the small (greater than 1.2 percent) lattice mismatch between CoSi2 and Si layers, high-quality and pinhole-free epilayers were achieved, providing a capability of fabricating all the junctions and connecting layers as a single growth process with one pumpdown. Well-defined multiple p-n junctions connected by CoSi2 layers were accomplished by employing a low growth temperature (greater than 700 C) and a low growth rate (less than 0.5 microns/hour). Producing negligible interdiffusion, the low growth temperature and rate also produced negligible pinholes in the CoSi2 layers. For the first time, a stack of three p-n junctions connected by two 10(exp -5) Ohm-cm CoSi2 layers was achieved, meeting the high conversion efficiency requirement. This process can now be optimized for high growth rate to form a practical converter with 10 p-n junctions in the stack.

  5. 51. VIEW TO SOUTHWEST; SOUTH END OF MBE BUILDING, SECOND ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    51. VIEW TO SOUTHWEST; SOUTH END OF MBE BUILDING, SECOND FLOOR; MAIN ENTRANCE TO FORMER REGIONAL OFFICES OF REA (Andersen) - Los Angeles Union Passenger Terminal, Mail, Baggage, & Express Building, 800 North Alameda Street, Los Angeles, Los Angeles County, CA

  6. 39. VIEW TO NORTHEAST; WEST FRONT MBE BUILDING, FIRST FLOOR, ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    39. VIEW TO NORTHEAST; WEST FRONT MBE BUILDING, FIRST FLOOR, FRED HARVEY NEWSSTAND STOREROOM (AREA BURNED BY VANDALS) (Dobson) - Los Angeles Union Passenger Terminal, Mail, Baggage, & Express Building, 800 North Alameda Street, Los Angeles, Los Angeles County, CA

  7. 50. VIEW TO EAST; SOUTH END OF MBE BUILDING, FIRST ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    50. VIEW TO EAST; SOUTH END OF MBE BUILDING, FIRST FLOOR; SAFE, DOOR OPEN ELECTRONIC FLASH INTERIOR ILLUMINATION (Andersen) - Los Angeles Union Passenger Terminal, Mail, Baggage, & Express Building, 800 North Alameda Street, Los Angeles, Los Angeles County, CA

  8. 15. VIEW TO SOUTHWEST; EAST BACK MBE BUILDING, THIRD AND ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    15. VIEW TO SOUTHWEST; EAST BACK MBE BUILDING, THIRD AND SECOND FLOORS; GASOLINE PUMPS CENTER (Dobson) - Los Angeles Union Passenger Terminal, Mail, Baggage, & Express Building, 800 North Alameda Street, Los Angeles, Los Angeles County, CA

  9. 54. VIEW TO SOUTH; SOUTH END OF MBE BUILDING, THIRD ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    54. VIEW TO SOUTH; SOUTH END OF MBE BUILDING, THIRD FLOOR, HALLWAY AND DOOR TO FORMER REGIONAL OFFICES OF REA (Andersen) - Los Angeles Union Passenger Terminal, Mail, Baggage, & Express Building, 800 North Alameda Street, Los Angeles, Los Angeles County, CA

  10. 40 CFR 33.209 - Can EPA re-evaluate the MBE or WBE status of an entity after EPA certifies it to be an MBE or WBE?

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... 40 Protection of Environment 1 2011-07-01 2011-07-01 false Can EPA re-evaluate the MBE or WBE status of an entity after EPA certifies it to be an MBE or WBE? 33.209 Section 33.209 Protection of... EPA re-evaluate the MBE or WBE status of an entity after EPA certifies it to be an MBE or WBE? (a)...

  11. 40 CFR 33.503 - How does a recipient calculate MBE and WBE participation for reporting purposes?

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... attributable to the MBE or WBE. If an MBE's or WBE's risk of loss, control or management responsibilities is... performing a commercially useful function: (1) The MBE or WBE must be responsible for the management...

  12. 40 CFR 33.503 - How does a recipient calculate MBE and WBE participation for reporting purposes?

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... attributable to the MBE or WBE. If an MBE's or WBE's risk of loss, control or management responsibilities is... performing a commercially useful function: (1) The MBE or WBE must be responsible for the management...

  13. 40 CFR 33.503 - How does a recipient calculate MBE and WBE participation for reporting purposes?

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... attributable to the MBE or WBE. If an MBE's or WBE's risk of loss, control or management responsibilities is... performing a commercially useful function: (1) The MBE or WBE must be responsible for the management...

  14. 40 CFR 33.503 - How does a recipient calculate MBE and WBE participation for reporting purposes?

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... attributable to the MBE or WBE. If an MBE's or WBE's risk of loss, control or management responsibilities is... performing a commercially useful function: (1) The MBE or WBE must be responsible for the management...

  15. van der Waals Heterostructures Grown by MBE

    NASA Astrophysics Data System (ADS)

    Hinkle, Christopher

    In this work, we demonstrate the high-quality MBE heterostructure growth of various layered 2D materials by van der Waals epitaxy (VDWE). The coupling of different types of van der Waals materials including transition metal dichalcogenide thin films (e.g., WSe2, WTe2, HfSe2) , insulating hexagonal boron nitride (h-BN), and topological insulators (e.g., Bi2Se3) allows for the fabrication of novel electronic devices that take advantage of unique quantum confinement and spin-based characteristics. The relaxed lattice-matching criteria of van der Waals epitaxy has allowed for high-quality heterostructure growth with atomically abrupt interfaces, allowing us to couple these materials based primarily on their band alignment and electronic properties. We will discuss the impact of sample preparation, surface reactivity, and lattice mismatch of various substrates (sapphire, graphene, TMDs, Bi2Se3) on the growth mode and quality of the films and will discuss our studies of substrate temperature and flux rates on the resultant growth and grain size. Structural and chemical characterization was conducted via reflection high energy electron diffraction (RHEED, X-ray diffraction (XRD), transmission electron microscopy (TEM), scanning tunneling microscopy/spectroscopy (STM/S), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and Raman spectroscopy. Experimentally determined band alignments have been determined and compared with first-principles calculations allowing the design of novel low-power logic and magnetic memory devices. Initial results from the electrical characterization of these grown thin films and some simple devices will also be presented. These VDWE grown layered 2D materials show significant potential for fabricating novel heterostructures with tunable band alignments and magnetic properties for a variety of nanoelectronic and optoelectronic applications.

  16. Let the Questions Be Your Guide: MBE as Interdisciplinary Science

    ERIC Educational Resources Information Center

    Rose, L. Todd; Daley, Samantha G.; Rose, David H.

    2011-01-01

    From its inception, the field of Mind, Brain, and Education (MBE) has been conceived as an interdisciplinary science, and with good reason: The phenomena the field aims to understand often arise from interactions among multiple factors, span levels of analysis, and are context dependent. In this article, we argue that to reach its potential as an…

  17. 52. VIEW TO EAST; SOUTH END OF MBE BUILDING, SECOND ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    52. VIEW TO EAST; SOUTH END OF MBE BUILDING, SECOND FLOOR; HIGHLY ALTERED INTERIOR OFFICE SPACE, FORMERLY REGIONAL OFFICES OF REA (Andersen) - Los Angeles Union Passenger Terminal, Mail, Baggage, & Express Building, 800 North Alameda Street, Los Angeles, Los Angeles County, CA

  18. 53. VIEW TO SOUTHEAST; SOUTH END OF MBE BUILDING, SECOND ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    53. VIEW TO SOUTHEAST; SOUTH END OF MBE BUILDING, SECOND FLOOR; HIGHLY ALTERED INTERIOR OFFICE SPACE, FORMERLY REGIONAL OFFICES OF REA (Andersen) - Los Angeles Union Passenger Terminal, Mail, Baggage, & Express Building, 800 North Alameda Street, Los Angeles, Los Angeles County, CA

  19. 47. VIEW TO WEST; SOUTH END OF MBE BUILDING, FIRST ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    47. VIEW TO WEST; SOUTH END OF MBE BUILDING, FIRST FLOOR; FORMER PACKAGE HANDLING AREA ADJACENT TO FORMER PACIFIC ELECTRIC RAILWAY TERMINAL (Andersen) - Los Angeles Union Passenger Terminal, Mail, Baggage, & Express Building, 800 North Alameda Street, Los Angeles, Los Angeles County, CA

  20. MBE of wide bandgap II-VI compounds

    NASA Astrophysics Data System (ADS)

    Gunshor, R. L.; Kobayashi, M.; Kolodziejski, L. A.; Otsuka, N.; Nurmikko, A. V.

    1990-01-01

    A pseudomorphic epilayer/epilayer heterojunction consisting of ZnTe on AlSb, having potential for the development of novel visible light emitting injection devices, has been grown by MBE. A variety of microstructural and optical evaluation techniques have provided evidence of high structural quality. The nonequilibrium growth capability of the MBE technique has enabled the growth of heterostructures incorporating a previously hypothetical widegap magnetic semiconductor, the zincblende phase of MnTe. Electron diffraction measurements of cross-sectional samples reveal only zincblende phases. Double barrier structures incorporating zincblende MnTe are found to exhibit two-dimensional electron and hole confinement in CdTe and ZnTe quantum well layers, and serve to confirm the zincblende MnTe bandgap at 3.2 eV.

  1. Preface of the 18th International Conference on Molecular Beam Epitaxy (MBE 2014)

    NASA Astrophysics Data System (ADS)

    Brown, April S.; Ptak, Aaron J.

    2015-09-01

    The first International Conference on Molecular Beam Epitaxy (IC-MBE) was held in Paris in 1978, chaired by Alfred Y. Cho. Every other year since, with the exception of a four-year break after the initial meeting, the IC-MBE has been held in European, Asian, and North American venues. The 18th and latest IC-MBE was held in Flagstaff, Arizona, USA, September 7-12, 2014, and was chaired by Yong-Hang Zhang (Arizona State University). MBE is an advanced crystal growth method that benefits areas from the study of fundamental physics, all the way through the production of devices used in countless fields. IC-MBE brings together researchers from all over the world, and is the premier forum for scientific and technological exchange among researchers investigating all types of materials growth using the MBE technique.

  2. Evidence for void formation in MBE-grown silicon

    SciTech Connect

    Simpson, P.J.; Schultz, P.J. . Dept. of Physics Ontario Centre for Materials Research, Kingston, ON ); Jackman, T.E.; Aers, G.C.; Noeel, J.; Houghton, D.C. ); Perovic, D.D.; Weatherly, G.C. )

    1991-02-01

    In this paper, the authors give evidence for reproducible formation of voids of 3 to 6 nm diameter in (100) silicon epilayers, which were grown using molecular beam epitaxy (MBE) method in a narrow temperature range below 260 {degree}C. The results are given of an experimental investigation using variable-energy positrons and transmission electron microscopy (TEM). The expression used for the positron range, derived from work done below 10 keV, appears to be inaccurate when extrapolated to higher energy. (AIP)

  3. 40 CFR 33.211 - What is the process for appealing or challenging an EPA MBE or WBE certification determination?

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... challenging an EPA MBE or WBE certification determination? 33.211 Section 33.211 Protection of Environment... process for appealing or challenging an EPA MBE or WBE certification determination? (a) An entity which has been denied MBE or WBE certification by EPA OSDBU under § 33.205 or § 33.209 may appeal...

  4. 40 CFR 33.407 - How long do MBE and WBE fair share objectives remain in effect?

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 40 Protection of Environment 1 2010-07-01 2010-07-01 false How long do MBE and WBE fair share... ENVIRONMENTAL PROTECTION AGENCY PROGRAMS Fair Share Objectives § 33.407 How long do MBE and WBE fair share objectives remain in effect? Once MBE and WBE fair share objectives have been negotiated, they will remain...

  5. Transverse combining of 4 beams in MBE-4

    SciTech Connect

    Celata, C.M.; Chupp, W.; Faltens, A.; Fawley, W.M.; Ghiorso, W.; Hahn, K.D.; Henestroza, E.; Peters, C.; Seidl, P.

    1995-05-01

    Transverse beam combining is a cost-saving optio employed in many designs for induction linac heavy ion fusion drivers. But resultant transverse emittance increase, due predominantly to anharmonic space charoe forces, must be kept minimal so as not to sacrifice focusability at the target. A prototype combining experiment has been built, using the MBE-4 experiment. Four sources produce four 4 mA Cs{sup +} beams at 200 keV. The ion sources are angled toward each other, so that beams converge. Focusing upstream of the merge consists of 4 quadrupoles and a final combined-function element (quadrupole & dipole). All lattice elements are electrostatic. Due to the small distance between beams at the last element ({approximately} 2 mm), the electrodes here are a cage of small wires, each at different voltage. The beams emerge into the 30 period transport lattice of MBE-4 where emittance growth due to merging, as well as the subsequent evolution of the distribution function, can be diagnosed. The combiner design, simulation predictions, and preliminary results from the experiment are presented.

  6. Characterization of MBE-grown Semiconductor Materials for Photovoltaic Applications

    NASA Astrophysics Data System (ADS)

    Tang, Dinghao

    The research described in this dissertation involved the use of transmission electron microscopy (TEM) to characterize II-VI and III-V compound semiconductor quantum dots (QDs) and dilute-nitride alloys grown by molecular beam epitaxy (MBE) and intended for photovoltaic applications. The morphology of CdTe QDs prepared by the post-annealing MBE method were characterized by various microscopy techniques including high-resolution transmission electron microscopy (HR-TEM), and high-angle annular-dark-field scanning transmission electron microscopy (HAADF-STEM). Extensive observations revealed that the of QD shapes were not well-defined, and the QD size and spatial distribution were not determined by the amount of CdTe deposition. These results indicated that the formation of II-VI QDs using a post-annealing treatment did not follow the conventional growth mechanism for III-V and IV-IV materials. The structural properties of dilute-nitride GaAsNx films grown using plasma-assisted MBE were characterized by TEM and HAADF-STEM. A significant amount of the nitrogen incorporated into the dilute nitride films was found to be interstitial, and that fluctuations in local nitrogen composition also occurred during growth. Post-growth partial relaxation of strain resulted in the formation of {110}-oriented microcracks in the sample with the largest substitutional nitrogen composition. Single- and multi-layered InAs QDs grown on GaAsSb/GaAs composite substrates were investigated using HR-TEM and HAADF-STEM. Correlation between the structural and optoelectronic properties revealed that the GaAsSb barrier layers had played an important role in tuning the energy-band alignments but without affecting the overall structural morphology. However, according to both XRD measurement and electron microscopy the densities of dislocations increased as the number of QD layers built up. An investigation of near-wetting layer-free InAs QDs incorporated with AlAs/GaAs spacer layers was carried out

  7. Molecular Beam Epitaxial (MBE) Growth and Characterization of Thin Films of Semiconductor Tin

    NASA Astrophysics Data System (ADS)

    Folkes, P.; Taylor, P.; Rong, C.; Nichols, B.; Hier, H.; Burke, R.; Neupane, M.

    Recent theoretical predictions that a two-dimensional monolayer of semiconductor tin is a two-dimensional topological insulator and experimental evidence of three-dimensional topological insulator behavior in strained ultrathin films of semiconductor tin grown by MBE on InSb has generated intense research interest. This research is primarily focused on the MBE growth and topological characteristics of ultrathin films of semiconductor tin. In this talk we present results of a study on the MBE growth and the transport, structural and optical characterization of thin films of semiconductor tin on several different substrates.

  8. MBE grown high quality GaN films and devices

    NASA Astrophysics Data System (ADS)

    Kim, W.; Aktas, O.; Salvador, A.; Botchkarev, A.; Sverdlov, B.; Mohammad, S. N.; Morkoç, H.

    1997-02-01

    GaN films with much improved structural, transport, and optical properties have been prepared by molecular beam epitaxy using NH 3 as a nitrogen source. Films with a wide range of resistivity, including highly resistive ones, were grown with a chosen growth rate of 1.2 μm/h. The electron mobility in modulation doped structures is about 450 and 850 cm 2/Vs at 300 and 77 K, respectively, with an areal carrier concentration of about 10 13 cm -2. Low temperature luminescence shows A- and B-free-excitons as well as the excited state of the A- and B-excitons, the first known observation, attesting to the quality of the samples. These transition energies are consistent with the best MOCVD samples and represent a sizable reduction of the pandemic zincblende phase in MBE grown films. The high quality of films was demonstrated by the realization of high performance MODFETs and Schottky diodes.

  9. MBE-4, a heavy ion multiple-beam experiment

    SciTech Connect

    Avery, R.T.; Chavis, C.S.; Fessenden, T.J.; Gough, D.E.; Henderson, T.F.; Keefe, D.; Meneghetti, J.R.; Pike, C.D.; Vanecek, D.L.; Warwick, A.I.

    1985-05-01

    MBE-4, a heavy-ion multiple beam induction linac being built at LBL in FY85/86, will model many features of a much longer device. It will accelerate four space-charge-dominated cesium ion beams from, for example, 0.2 MeV, 5 mA/beam, 3.0 ..mu..sec, 1.6 m length at injection to approx.0.8 MeV, 15 mA/beam, 1.0 ..mu..sec, 1.1 m length at the exit. It will permit study of simultaneous focussing, acceleration, current amplification and emittance growth of multiple space-charge-dominated ion beams. Some features of this accelerator are described. 11 refs., 5 figs.

  10. MBE growth and magneto-optic properties of magnetic multilayers

    NASA Astrophysics Data System (ADS)

    Falco, Charles M.; Engel, Brad N.

    Recent interest in the magnetic and magneto-optic properties of transition metal/transition metal multilayers has been stimulated by the discovery of perpendicular magnetism in particular systems such as Co/Pd and Co/Pt. Due to their favorable magneto-optic wavelength dependence and enhanced corrosion resistance, these materials show promise as future data storage media. However, partially due to the large variety of thin-film deposition methods and growth conditions, it has been difficult to obtain a clear understanding of the mechanisms of magnetic anisotropy in these systems. In order to create controlled and well characterized model systems, we have grown a series of epitaxial Co/Pd superlattices oriented along the three high-symmetry crystal directions [001], [110], and [111] on single-crystal GaAs substrates by molecular beam epitaxy [MBE]. Simultaneously, we have deposited polycrystalline Co/Pd multilayers on Si substrates mounted alongside the GaAs for direct comparisons of epitaxial and non-epitaxial films produced under identical conditions. The structural properties of these multilayers were determined by low-and reflection high-energy electron diffraction (LEED and RHEED), low- and high-angle X-ray diffraction, and scanning tunneling microscopy (STM). The dependence of the uniaxial magnetic anisotropy energy on the Co thickness in these superlattices showed significant systematic differences for each of the three crystal orientations. A review of our work on the structural influences responsible for these differences is presented.

  11. 40 CFR 33.209 - Can EPA re-evaluate the MBE or WBE status of an entity after EPA certifies it to be an MBE or WBE?

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 40 Protection of Environment 1 2010-07-01 2010-07-01 false Can EPA re-evaluate the MBE or WBE... Environment ENVIRONMENTAL PROTECTION AGENCY GRANTS AND OTHER FEDERAL ASSISTANCE PARTICIPATION BY DISADVANTAGED BUSINESS ENTERPRISES IN UNITED STATES ENVIRONMENTAL PROTECTION AGENCY PROGRAMS Certification § 33.209...

  12. Multiband spectral emitters matched to MBE grown photovoltaic cells

    SciTech Connect

    Wong, E.M.; Hickey, J.P.; Holmquist, G.A.; Uppal, P.N.; Waldman, C.H.

    1996-02-01

    Clearly TPV devices are of considerable interest for power generation. For practical devices it is desirable to have high efficiencies combined with low temperature operation. Photovoltaic cells which can convert the energy at the longer wavelengths of interest are needed to complete such a system. The spectral emission peak of Yb{sub 2}O{sub 3} is well matched to the band gap of Si; however, the longer wavelength, spectral emissions of other rare earth oxides can also be exploited through the use of III{endash}V semiconductor compounds such as GaSb or alloys of GaInAsSb. By doping GaSb with InAs, the band gap of the resulting material can be effectively varied depending upon the concentration of InAs in the quaternary alloy. The ability to tailor the emitter materials and, in conjunction, the photovoltaic materials leads to greater efficiencies through spectral matching. Two binary rare earth oxide combinations, Er{sub 2}O{sub 3}/Ho{sub 2}O{sub 3} and Er{sub 2}O{sub 3}/Yb{sub 2}O{sub 3}, were studied. The mixtures were found to give multiple peak spectral emission in the wavelengths of interest. The intensity of the peaks were compositionally dependent though it did not vary in a linear fashion. Photon efficiencies of the molecular beam epitaxially (MBE) grown GaSb cell and GaInAsSb quaternary cell were measured when used in conjunction with the Er{sub 2}O{sub 3}/Ho{sub 2}O{sub 3} emitters in which the concentration of Er{sub 2}O{sub 3} and Ho{sub 2}O{sub 3} were varied. The results demonstrated promise for further work. {copyright} {ital 1996 American Institute of Physics.}

  13. 40 CFR 33.503 - How does a recipient calculate MBE and WBE participation for reporting purposes?

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... attributable to the MBE or WBE. If an MBE's or WBE's risk of loss, control or management responsibilities is... ENVIRONMENTAL PROTECTION AGENCY GRANTS AND OTHER FEDERAL ASSISTANCE PARTICIPATION BY DISADVANTAGED BUSINESS... consistent with normal business practices. (1) Presumption. If 50% or more of the total dollar amount of...

  14. 40 CFR 33.208 - How long does an MBE or WBE certification from EPA last?

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 40 Protection of Environment 1 2010-07-01 2010-07-01 false How long does an MBE or WBE certification from EPA last? 33.208 Section 33.208 Protection of Environment ENVIRONMENTAL PROTECTION AGENCY GRANTS AND OTHER FEDERAL ASSISTANCE PARTICIPATION BY DISADVANTAGED BUSINESS ENTERPRISES IN UNITED...

  15. 40 CFR 33.207 - Can an entity reapply to EPA for MBE or WBE certification?

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 40 Protection of Environment 1 2010-07-01 2010-07-01 false Can an entity reapply to EPA for MBE or WBE certification? 33.207 Section 33.207 Protection of Environment ENVIRONMENTAL PROTECTION AGENCY GRANTS AND OTHER FEDERAL ASSISTANCE PARTICIPATION BY DISADVANTAGED BUSINESS ENTERPRISES IN UNITED...

  16. Large format MBE HgCdTe on silicon detector development for astronomy

    NASA Astrophysics Data System (ADS)

    Hanold, Brandon J.; Figer, Donald F.; Lee, Joong; Kolb, Kimberly; Marcuson, Iain; Corrales, Elizabeth; Getty, Jonathan; Mears, Lynn

    2015-08-01

    The Center for Detectors at Rochester Institute of Technology and Raytheon Vision Systems (RVS) are leveraging RVS capabilities to produce large format, short-wave infrared HgCdTe focal plane arrays on silicon (Si) substrate wafers. Molecular beam epitaxial (MBE) grown HgCdTe on Si can reduce detector fabrication costs dramatically, while keeping performance competitive with HgCdTe grown on CdZnTe. Reduction in detector costs will alleviate a dominant expense for observational astrophysics telescopes. This paper presents the characterization of 2.5μm cutoff MBE HgCdTe/Si detectors including pre- and post-thinning performance. Detector characteristics presented include dark current, read noise, spectral response, persistence, linearity, crosstalk probability, and analysis of material defects.

  17. Performance of MBE-4: An experimental multiple beam induction linear accelerator for heavy ions

    SciTech Connect

    Warwick, A.I.; Fessenden, T.J.; Keefe, D.; Kim, C.H.; Meuth, H.

    1988-06-01

    An experimental induction linac, called MBE-4, has been constructed to demonstrate acceleration and current amplification of multiple heavy ion beams. This work is part of a program to study the use of such an accelerator as a driver for heavy ion inertial fusion. MBE-4 is 16m long and accelerates four space-charge-dominated beams of singly-charged cesium ions, in this case from 200 keV to 700 keV, amplifying the current in each beam from 10mA by a factor of nine. Construction of the experiment was completed late in 1987 and we present the results of detailed measurements of the longitudinal beam dynamics. Of particular interest is the contribution of acceleration errors to the growth of current fluctuations and to the longitudinal emittance. The effectiveness of the longitudinal focusing, accomplished by means of the controlled time dependence of the accelerating fields, is also discussed. 4 refs., 5 figs., 1 tab.

  18. Growth of III-V films by control of MBE growth front stoichiometry

    NASA Technical Reports Server (NTRS)

    Grunthaner, Frank J. (Inventor); Liu, John K. (Inventor); Hancock, Bruce R. (Inventor)

    1992-01-01

    For the growth of strain-layer materials and high quality single and multiple quantum wells, the instantaneous control of growth front stoichiometry is critical. The process of the invention adjusts the offset or phase of molecular beam epitaxy (MBE) control shutters to program the instantaneous arrival or flux rate of In and As4 reactants to grow InAs. The interrupted growth of first In, then As4, is also a key feature.

  19. Application of modern control theory to temperature control of the MBE system

    NASA Astrophysics Data System (ADS)

    Ishikawa, Takuya; Chan, Yuen Chuen; Nakano, Yoshiaki; Tada, Kunio

    1990-03-01

    The setup of an MBE control system without PID controllers, whereby one microprocessor manages all the Knudsen cells directly, is reported. The model-following algorithm is applied to the temperature control of the Knudsen cells, and improved dynamic response of the cell temperature is obtained compared with that obtained by the conventional PID algorithm. An application of the model-following algorithm to device fabrication is demonstrated.

  20. New MBE buffer for micron- and quarter-micron-gateGaAs MESFETs

    NASA Technical Reports Server (NTRS)

    1988-01-01

    A new buffer layer has been developed that eliminates backgating in GaAs MESFETs and substantially reduces short-channel effects in GaAs MESFETs with 0.27-micron-long gates. The new buffer is grown by molecular beam epitaxy (MBE) at a substrate temperature of 200 C using Ga and As sub 4 beam fluxes. The buffer is crystalline, highly resistive, optically inactive, and can be overgrown with high quality GaAs. GaAs MESFETs with a gate length of 0.27 microns that incorporate the new buffer show improved dc and RF properties in comparison with a similar MESFET with a thin undoped GaAs buffer. To demonstrate the backgating performance improvement afforded by the new buffer, MESFETs were fabricated using a number of different buffer layers and structures. A schematic cross section of the MESFET structure used in this study is shown. The measured gate length, gate width, and source-drain spacing of this device are 2,98, and 5.5 microns, respectively. An ohmic contact, isolated from the MESFET by mesa etching, served as the sidegate. The MESFETs were fabricated in MBE n-GaAs layers grown on the new buffer and also in MBE n-GaAs layers grown on buffer layers of undoped GaAs, AlGaAs, and GaAs/AlGaAs superlattices. All the buffer layers were grown by MBE and are 2 microns thick. The active layer is doped to approximately 2 x 10 to the 17th/cu cm with silicon and is 0.3 microns thick.

  1. Static and dynamic magnetic property of MBE-grown Co2FeAl films

    NASA Astrophysics Data System (ADS)

    Qiao, Shuang; Nie, Shuaihua; Huo, Yan; Zhao, Jianhua; Wu, Yizheng; Zhang, Xinhui

    2014-08-01

    In this work, the static and dynamic magnetic properties of Co2FeAl films grown by molecular beam epitaxy (MBE) were studied by employing the magneto-optical Kerr rotation and ferromagnetic resonance (FMR) measurements. The growth temperature dependent magnetocrystalline anisotropy of MBE-grown Co2FeAl films were first investigated by employing the rotating magneto-optical Kerr effect. Then the magnetization dynamics and Gilbert damping property for high quality Co2FeAl films were investigated in detail by combining both the FMR and time-resolved magneto-optical Kerr rotation techniques. The apparent damping parameter was found to show strong dependence on the strength of the applied magnetic field at low-field regime, but decrease drastically with increasing magnetic field and eventually become a constant value of 0.004 at high-field regime. The inhomogeneity of magnetocrystalline anisotropy and two-magnon scattering are suggested to be responsible for the observed abnormal damping properties observed especially at low field regime. The intrinsic damping parameter of 0.004 is deduced for our highly-ordered Co2FeAl film. Our results provide essential information for highly-ordered MBE-grown Co2FeA film and its possible application in spintronic devices.

  2. Recent progress in MBE grown HgCdTe materials and devices at UWA

    NASA Astrophysics Data System (ADS)

    Gu, R.; Lei, W.; Antoszewski, J.; Madni, I.; Umana-Menbreno, G.; Faraone, L.

    2016-05-01

    HgCdTe has dominated the high performance end of the IR detector market for decades. At present, the fabrication costs of HgCdTe based advanced infrared devices is relatively high, due to the low yield associated with lattice matched CdZnTe substrates and a complicated cooling system. One approach to ease this problem is to use a cost effective alternative substrate, such as Si or GaAs. Recently, GaSb has emerged as a new alternative with better lattice matching. In addition, implementation of MBE-grown unipolar n-type/barrier/n-type detector structures in the HgCdTe material system has been recently proposed and studied intensively to enhance the detector operating temperature. The unipolar nBn photodetector structure can be used to substantially reduce dark current and noise without impeding photocurrent flow. In this paper, recent progress in MBE growth of HgCdTe infrared material at the University of Western Australia (UWA) is reported, including MBE growth of HgCdTe on GaSb alternative substrates and growth of HgCdTe nBn structures.

  3. Arsenic p-Doping of HgCdTe Grown by Molecular Beam Epitaxy (MBE): A Solved Problem?

    NASA Astrophysics Data System (ADS)

    Garland, James W.; Grein, Christoph; Sivananthan, Sivalingam

    2013-11-01

    The goal of achieving well-controlled, reproducibly p-doped mercury cadmium telluride (HgCdTe) with sharp p- n junctions and low Shockley-Read-Hall contribution τ SRH to the minority carrier lifetime τ has been pursued for the past 30 years by the HgCdTe molecular beam epitaxial (MBE) growth community, but remains elusive. On the other hand, n-doping with In avoids the short τ SRH characteristic of arsenic-doped MBE-grown HgCdTe and is well controlled, stable, and reproducibly 100% activated as-grown. However, as discussed herein, because of inherent limitations of n-doped absorber layers, overcoming the challenges of successfully p-doping HgCdTe remains an important problem, especially for long-wavelength infrared detectors. We briefly review the achievements that have been made in p-doping HgCdTe, point out the reasons why achieving well-controlled, reproducibly p-doped MBE-grown HgCdTe with a lifetime τ not limited by τ SRH remains a very important task, discuss the probable origin of the short τ SRH in MBE-grown HgCdTe, and discuss possible ways to achieve much longer values of τ SRH in MBE-grown p-doped HgCdTe.

  4. Modified MBE hardware and techniques and role of gallium purity for attainment of two dimensional electron gas mobility >35×106 cm2/V s in AlGaAs/GaAs quantum wells grown by MBE

    NASA Astrophysics Data System (ADS)

    Gardner, Geoffrey C.; Fallahi, Saeed; Watson, John D.; Manfra, Michael J.

    2016-05-01

    We provide evidence that gallium purity is the primary impediment to attainment of ultra-high mobility in a two-dimensional electron gas (2DEG) in AlGaAs/GaAs heterostructures grown by molecular beam epitaxy (MBE). The purity of gallium can be enhanced dramatically by in-situ high temperature outgassing within an operating MBE. Based on analysis of data from an initial growth campaign in a new MBE system and modifications employed for a 2nd growth campaign, we have produced 2DEGs with low temperature mobility μ in excess of 35×106 cm2/V s at density n=3.0×1011/cm2 and μ=18×106 cm2/V s at n=1.1×1011/cm2. Our 2nd campaign data indicate that gallium purity remains the factor currently limiting μ<40×106 cm2/V s. We describe strategies to overcome this limitation.

  5. MBE based HgCdTe APDs and 3D LADAR sensors

    NASA Astrophysics Data System (ADS)

    Jack, Michael; Asbrock, Jim; Bailey, Steven; Baley, Diane; Chapman, George; Crawford, Gina; Drafahl, Betsy; Herrin, Eileen; Kvaas, Robert; McKeag, William; Randall, Valerie; De Lyon, Terry; Hunter, Andy; Jensen, John; Roberts, Tom; Trotta, Patrick; Cook, T. Dean

    2007-04-01

    Raytheon is developing HgCdTe APD arrays and sensor chip assemblies (SCAs) for scanning and staring LADAR systems. The nonlinear characteristics of APDs operating in moderate gain mode place severe requirements on layer thickness and doping uniformity as well as defect density. MBE based HgCdTe APD arrays, engineered for high performance, meet the stringent requirements of low defects, excellent uniformity and reproducibility. In situ controls for alloy composition and substrate temperature have been implemented at HRL, LLC and Raytheon Vision Systems and enable consistent run to run results. The novel epitaxial designed using separate absorption-multiplication (SAM) architectures enables the realization of the unique advantages of HgCdTe including: tunable wavelength, low-noise, high-fill factor, low-crosstalk, and ambient operation. Focal planes built by integrating MBE detectors arrays processed in a 2 x 128 format have been integrated with 2 x 128 scanning ROIC designed. The ROIC reports both range and intensity and can detect multiple laser returns with each pixel autonomously reporting the return. FPAs show exceptionally good bias uniformity <1% at an average gain of 10. Recent breakthrough in device design has resulted in APDs operating at 300K with essentially no excess noise to gains in excess of 100, low NEP <1nW and GHz bandwidth. 3D LADAR sensors utilizing these FPAs have been integrated and demonstrated both at Raytheon Missile Systems and Naval Air Warfare Center Weapons Division at China Lake. Excellent spatial and range resolution has been achieved with 3D imagery demonstrated both at short range and long range. Ongoing development under an Air Force Sponsored MANTECH program of high performance HgCdTe MBE APDs grown on large silicon wafers promise significant FPA cost reduction both by increasing the number of arrays on a given wafer and enabling automated processing.

  6. Fabrication of photonic crystal lasers by MBE air-hole retained growth

    NASA Astrophysics Data System (ADS)

    Nishimoto, Masaya; Ishizaki, Kenji; Maekawa, Kyohei; Liang, Yong; Kitamura, Kyoko; Noda, Susumu

    2014-09-01

    We report the fabrication of photonic crystal surface-emitting lasers using an MBE air-hole retained growth method. We demonstrate the achievement of single-mode oscillation and observe a single-lobed, linearly polarized beam. We also use three-dimensional coupled wave analysis to calculate the effects of using different air-hole shapes, which determine the beam shape and polarization. A single-lobed, linearly polarized beam can be obtained by modifying the air holes from circular to a tilted-corn shape after growth.

  7. New MBE (molecular beam epitaxy) buffer used to eliminate backgating in gaas mesfets

    SciTech Connect

    Smith, F.W.; Calawa, A.R.; Chen, C.L.; Manfra, M.J.; Mahoney, L.J.

    1988-02-01

    A new buffer layer has been developed that eliminates backgating between MESFET's fabricated in active layers grown upon it. The new buffer is grown by molecular beam epitaxy (MBE) at low substrate temperatures (150-300 C) using Ga and As4 beam fluxes. It is highly resistive, optically inactive, and crystalline, and high-quality GaAs active layers can be grown on top of the new buffer. MESFET's fabricated in active layers grown on top of this new buffer show improved output resistance and breakdown voltages; the dc and Rf characteristics are otherwise comparable to MESFET's fabricated by alternative means and with other buffer layers.

  8. Self-organized MBE growth of II VI epilayers on patterned GaSb substrates

    NASA Astrophysics Data System (ADS)

    Wissmann, H.; Tran Anh, T.; Rogaschewski, S.; von Ortenberg, M.

    1999-05-01

    We report on the self-organized MBE growth of II-VI epilayers on patterned and unpatterned GaSb substrates resulting in quantum wires and quantum wells, respectively. The HgSe : Fe quantum wires were grown on (0 0 1)GaSb substrates with a buffer of lattice-matched ZnTe 1- xSe x. Due to the anisotropic growth of HgSe on the A-oriented stripes roof-like overgrowth with a definite ridge was obtained. Additional Fe doping in the direct vicinity of the ridge results in a highly conductive quantum wire.

  9. Si-doped GaAs/AlGaAs TJS laser by MBE

    SciTech Connect

    Mitsunaga, K.; Fujiwara, K.; Nunoshita, M.; Nakayama, T.

    1984-04-01

    The effect of high temperature annealing on the properties of silicon-doped GaAs/AlGaAs double heterostructure (DH) grown by molecular beam expitaxy (MBE)= and its application to the fabrication of transverse junction stripe (TJS) lasers are reported. In spite of the amphoteric nature of Si, it was found that the high temperature annealing gave little influence on the electrical and optical quality of the n-type DH wafer. The TJS laser using Si-doped GaAs/AlGaAs wafer has been oscillated cw at room temperature and exhibited low threshold current of 30 mA and high quantum efficiency of 60%.

  10. Experimental investigation of MBE GaAs rib waveguides at 10.6 microns

    NASA Astrophysics Data System (ADS)

    Sarkis, R. G.; Larson, D. C.; Jenkinson, H. A.

    1989-10-01

    Results are evaluated from recent investigations of the performance of n/n(+)-GaAs rib waveguides fabricated by MBE and reactive-ion etching. A simple, 'effective index' analysis method is used to predict bound-mode propagation constants; a comparison with alternative analyses shows the method to be sufficiently accurate for the geometries in question. Intensity curves are obtained experimentally as a function of incident angle, for correlation with theoretical, lower-order modes. A prism-coupling approach is developed which not only allows experimenters to excite and observe the bands of a rib waveguide, but to empirically determine their values.

  11. Effects of incident short wavelength (UV) light on the morphology of MBE grown GaAs

    NASA Astrophysics Data System (ADS)

    Beaton, Daniel A.; Sanders, Charlotte; Alberi, Kirstin

    2014-03-01

    The exploration of novel semiconductor materials increasingly relies on growth techniques that operate far from equilibrium in order to overcome thermodynamic limitations to synthesis. As one example, low temperature molecular beam epitaxy (MBE) offers a pathway to enhance substitutional dopant incorporation over surface segregation but adatom mobility suffers as a consequence and leads to higher concentrations of lattice defects. We explore the use of external stimuli, namely incident UV light, as a means to influence adatom kinetics; UV light is absorbed in the first few atomic layers of the as-growing epitaxial film and the effects of the incident radiation predominantly effect only the surface adatoms. GaAs homoepitaxy by MBE is studied as a model case as a function of illumination conditions under broadband Xe and KrF excimer laser irradiation. In-situ reflective high energy electron diffraction analysis paired with ex-situ atomic force microscopy measurements yields insight into the effects of photon irradiation on surface adatom mobility, morphology and smoothing processes. This work was supported by the DOE Office of Science, Basic Energy Sciences under contract DE-AC36-08GO28308.

  12. Unraveling the electron pairing mechanism of FeSe by MBE and STM

    NASA Astrophysics Data System (ADS)

    Song, Canli

    Studies of high-transition-temperature superconductivity usually suffer from various imperfections in materials. Here we apply the state-of-the-art molecular beam epitaxy (MBE) to prepare controllably high-quality FeSe films on various substrates, and explore their superconducting properties using cryogenic scanning tunneling microscope. Single impurities, twin boundaries as well as strain are found in the MBE-grown FeSe films on graphene, and invariably suppress the superconductivity. Meanwhile, electronic nematicity and signatures of a bosonic mode, whose energy also decreases with strain, were identified. More significantly, we observed two disconnected superconducting domes at alkali-metal potassium (K)-dosed FeSe surface, stepping towards the mechanistic understanding of superconductivity in FeSe-derived superconductors. Our results are clarifying the secret of high-Tc superconductivity in FeSe-related superconductors, and by implications, in other unconventional superconductors, and guiding how to enhance Tc by interface engineering. This work was nancially supported by National Science Foundation and Ministry of Science and Technology of China.

  13. MBE Growth of Ferromagnetic Metal/Compound Semiconductor Heterostructures for Spintronics

    ScienceCinema

    Palmstrom, Chris [University of California, Santa Barbara, California, United States

    2010-01-08

    Electrical transport and spin-dependent transport across ferromagnet/semiconductor contacts is crucial in the realization of spintronic devices. Interfacial reactions, the formation of non-magnetic interlayers, and conductivity mismatch have been attributed to low spin injection efficiency. MBE has been used to grow epitaxial ferromagnetic metal/GA(1-x)AL(x)As heterostructures with the aim of controlling the interfacial structural, electronic, and magnetic properties. In situ, STM, XPS, RHEED and LEED, and ex situ XRD, RBS, TEM, magnetotransport, and magnetic characterization have been used to develop ferromagnetic elemental and metallic compound/compound semiconductor tunneling contacts for spin injection. The efficiency of the spin polarized current injected from the ferromagnetic contact has been determined by measuring the electroluminescence polarization of the light emitted from/GA(1-x)AL(x)As light-emitting diodes as a function of applied magnetic field and temperature. Interfacial reactions during MBE growth and post-growth anneal, as well as the semiconductor device band structure, were found to have a dramatic influence on the measured spin injection, including sign reversal. Lateral spin-transport devices with epitaxial ferromagnetic metal source and drain tunnel barrier contacts have been fabricated with the demonstration of electrical detection and the bias dependence of spin-polarized electron injection and accumulation at the contacts. This talk emphasizes the progress and achievements in the epitaxial growth of a number of ferromagnetic compounds/III-V semiconductor heterostructures and the progress towards spintronic devices.

  14. Thermal stability of MBE-grown epitaxial MoSe2 and WSe2 thin films

    NASA Astrophysics Data System (ADS)

    Chang, Young Jun; Choy, Byoung Ki; Phark, Soo-Hyon; Kim, Minu

    Layered transition metal dichalcogenides (TMDs) draw much attention, because of its unique optical properties and band structures depending on the layer thicknesses. However, MBE growth of epitaxial films demands information about thermal stability of stoichiometry and related electronic structure for high temperature range. We grow epitaxial MoSe2 and WSe2 ultrathin films by using molecular beam epitaxy (MBE). We characterize stoichiometry of films grown at various growth temperature by using various methods, XPS, EDX, and TOF-MEIS. We further test high temperature stability of electronic structure for those films by utilizing in-situ ellipsometry attached to UHV chamber. We discuss threshold temperatures up to 700~1000oC, at which electronic phases changes from semiconductor to metal due to selenium deficiency. This information can be useful for potential application of TMDs for fabrication of Van der Waals multilayers and related devices. This research was supported by Nano.Material Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning. (2009-0082580), NRF-2014R1A1A1002868.

  15. MBE Growth of Ferromagnetic Metal/Compound Semiconductor Heterostructures for Spintronics

    SciTech Connect

    Palmstrom, Chris

    2009-07-01

    Electrical transport and spin-dependent transport across ferromagnet/semiconductor contacts is crucial in the realization of spintronic devices. Interfacial reactions, the formation of non-magnetic interlayers, and conductivity mismatch have been attributed to low spin injection efficiency. MBE has been used to grow epitaxial ferromagnetic metal/GA(1-x)AL(x)As heterostructures with the aim of controlling the interfacial structural, electronic, and magnetic properties. In situ, STM, XPS, RHEED and LEED, and ex situ XRD, RBS, TEM, magnetotransport, and magnetic characterization have been used to develop ferromagnetic elemental and metallic compound/compound semiconductor tunneling contacts for spin injection. The efficiency of the spin polarized current injected from the ferromagnetic contact has been determined by measuring the electroluminescence polarization of the light emitted from/GA(1-x)AL(x)As light-emitting diodes as a function of applied magnetic field and temperature. Interfacial reactions during MBE growth and post-growth anneal, as well as the semiconductor device band structure, were found to have a dramatic influence on the measured spin injection, including sign reversal. Lateral spin-transport devices with epitaxial ferromagnetic metal source and drain tunnel barrier contacts have been fabricated with the demonstration of electrical detection and the bias dependence of spin-polarized electron injection and accumulation at the contacts. This talk emphasizes the progress and achievements in the epitaxial growth of a number of ferromagnetic compounds/III-V semiconductor heterostructures and the progress towards spintronic devices.

  16. Impact of Tellurium Precipitates in CdZnTe Substrates on MBE HgCdTe Deposition

    NASA Astrophysics Data System (ADS)

    Benson, J. D.; Bubulac, L. O.; Smith, P. J.; Jacobs, R. N.; Markunas, J. K.; Jaime-Vasquez, M.; Almeida, L. A.; Stoltz, A.; Wijewarnasuriya, P. S.; Brill, G.; Chen, Y.; Peterson, J.; Reddy, M.; Vilela, M. F.; Johnson, S. M.; Lofgreen, D. D.; Yulius, A.; Bostrup, G.; Carmody, M.; Lee, D.; Couture, S.

    2014-11-01

    State-of-the-art (112)B CdZnTe substrates were examined for near-surface tellurium precipitate-related defects. The Te precipitate density was observed to be fairly uniform throughout the bulk of the wafer, including the near-surface region. After a molecular beam epitaxy (MBE) preparation etch, exposed Te precipitates, small pits, and bumps on the (112)B surface of the CdZnTe wafer were observed. From near-infrared and dark field microscopy, the bumps and small pits on the CdZnTe surface are associated with strings of Te precipitates. Raised bumps are Te precipitates near the surface of the (112)B CdZnTe where the MBE preparation etch has not yet exposed the Te precipitate(s). An exposed Te precipitate sticking above the etched CdZnTe surface plane occurs when the MBE preparation etch rapidly undercuts a Te precipitate. Shallow surface pits are formed when the Te precipitate is completely undercut from the surrounding (112)B surface plane. The Te precipitate that was previously located at the center of the pit is liberated by the MBE preparation etch process.

  17. Polycrystalline ZnS(x)Se(1 - x) thin films deposited on ITO glass by MBE.

    PubMed

    Shen, Da-Ke; Sou, I K; Han, Gao-Rong; Du, Pi-Yi; Que, Duan-Lin

    2003-01-01

    MBE growth of ZnS(x)Se(1 - x) thin films on ITO coated glass substrates were carried out using ZnS and Se sources with the substrate temperature ranging from 270 degrees C to 330 degrees C . The XRD theta/2theta spectra resulted from these films indicated that the as-grown polycrystalline ZnS(x)Se(1 - x) thin films had a preferred orientation along the (111) planes. The evaluated crystal sizes as deduced from the FWHM of the XRD layer peaks showed strong growth temperature dependence, with the optimized temperature being about 290 degrees C. Both AFM and TEM measurements of these thin films also indicated a similar growth temperature dependence. High quality ZnS(x)Se(1 - x) thin film grown at the optimized temperature had the smoothest surface with lowest RMS value of 1.2 nm and TEM cross-sectional micrograph showing a well defined columnar structure. PMID:12659224

  18. Surface structure transitions on (0 0 1) GaAs during MBE

    NASA Astrophysics Data System (ADS)

    Preobrazhenskii, V. V.; Putyato, M. A.; Pchelyakov, O. P.; Semyagin, B. R.

    1999-05-01

    Experimental phase diagrams of GaAs (0 0 1) surface were obtained by direct measuring of the As 4 flux and the substrate temperature. The infringement of the epitaxial growth was found to occur at the ratio of As 4 to Ga fluxes less than or equal to 0.25. Hence, the As 4 incorporation coefficient is close to unity during MBE. A diffusion model was suggested to describe positions of boundaries between surface structures (SS) in the phase diagrams. Dependencies of temperatures of SS transitions on the rate of surface heating in the absence of incident fluxes were obtained. The transition temperatures were discovered to tend to constant values as the heating rate increased. A model underlying this dependence was developed.

  19. Drift compression experiments on MBE-4 and related emittance growth phenomena

    SciTech Connect

    Eylon, S.; Faltens, A.; Fawley, W.; Garvey, T.; Hahn, K.; Henestroza, E.; Smith, L.

    1991-04-01

    We have recently conducted a series of experiments on the MBE-4 heavy ion accelerator in which a velocity tilt was placed on the beam in the first accelerating section beyond the injector, followed by drift compression over the remaining 11 meters. Depending upon the magnitude of the velocity tilt and the accompanying mismatch in the focusing lattice, emittance growth was observed, manifested by butterfly'' shapes in x {minus} x{prime} phase space. We discuss various analytical limits on ion beam compression and relate them to these experiments and also to a driver for a heavy ion fusion reactor. We also present numerical simulations which investigate various aspects of compression and consequent emittance growth. 2 refs., 3 figs., 1 tab.

  20. An overview of hgcdte mbe defects and analysis of defect size

    NASA Astrophysics Data System (ADS)

    Olsson, Kurt Robert

    HgCdTe is the most widely used material for high performance infrared detection applications. Growth of HgCdTe epitaxial layers by molecular beam epitaxy (MBE) has ushered in advanced devices that take advantage of the unique properties of the material. Formation of defects during the growth process is one of the largest drawbacks to this technology, and must be minimized to increase device operability. In this paper, the defects encountered in HgCdTe are categorized, along with formation mechanisms and possible means of reduction. A new method of defect identification is proposed, which takes advantage of full wafer defect mapping capabilities. A correlation between the thickness of the grown film and the size of defects initiated at the substrate surface is found. This allows further defect information to be extracted from the size and density of the defects.

  1. Incorporation and desorption of sulphur In InP grown by MBE

    NASA Astrophysics Data System (ADS)

    Airaksinen, V. M.; Cheng, T. S.; Stanley, C. R.

    1987-02-01

    Sulphur doped InP has been grown by molecular beam epitaxy (MBE) using an electrochemical cell as a source of sulphur dimer S 2. At growth temperatures of over 500°C sulphur is lost from the layers as a volatile indium sulphide which desorbs with an activation energy of 4.5 eV. The concentration of incorporated sulphur ( C S) is linearly proportional to the incident sulphur flux both at low ( T s < 500°C) and high ( T s > 500°C) growth temperatures, indicating first order kinetics of incorporation and desorption f sulphur. The desorption cannot be suppressed by increasing the P 2: In flux ratio. The desorption rate is also independent of the incident indium flux. A thermodynamic analysis shows that the most likely desorbing species is In 2S.

  2. Nitride-MBE system for in situ synchrotron X-ray measurements

    NASA Astrophysics Data System (ADS)

    Sasaki, Takuo; Ishikawa, Fumitaro; Yamaguchi, Tomohiro; Takahasi, Masamitu

    2016-05-01

    A molecular beam epitaxy (MBE) chamber dedicated to nitride growth was developed at the synchrotron radiation facility SPring-8. This chamber has two beryllium windows for incident and outgoing X-rays, and is directly connected to an X-ray diffractometer, enabling in situ synchrotron X-ray measurements during the nitride growth. Experimental results on initial growth dynamics in GaN/SiC, AlN/SiC, and InN/GaN heteroepitaxy were presented. We achieved high-speed and high-sensitivity reciprocal space mapping with a thickness resolution of atomic-layer scale. This in situ measurement using the high-brilliance synchrotron light source will be useful for evaluating structural variations in the initial growth stage of nitride semiconductors.

  3. The Mid-Barremian Event (MBE): the Prelude to the OAE1a

    NASA Astrophysics Data System (ADS)

    Coccioni, R.; Galeotti, S.; Sprovieri, M.

    2003-12-01

    Detailed litho-, bio- and chemostratigraphic investigations of the Hauterivian-lowermost Aptian Maiolica pelagic limestones in the Umbria-Marche sequence, allowed to identify that the Selli Level, which is the regional sedimentary expression of the OAE 1a, represents the climax of a ca. 5 myr-long cycle of black shale deposition starting at the lower/upper Barremian boundary within polarity Chronozone M3 and H. similis-H. kutznetsovae planktonic foraminiferal Zone, that is in the lowermost part of the calcareous nannofossil Zone NC 5D. This long-term cycle starts with a prominent short-term event, here named mid-Barremian Event (MBE), which is associated with several changes in the biotic and abiotic records. In particular, a comparison of the available chemo- litho-, and biostratigraphic data from the Umbria-Marche Basin, allows to recognise that the MBE is defined by: 1) a 0.5 per mil positive shift in the carbon isotope values (Hadji, 1993; unpublished data); 2) a major step in the initial evolutive radiation of planktonic foraminifera (unpublished data); 3) a major turnover in the radiolarian assemblages (Jud, 1994; O'Dogherty, 1994). The above mentioned change in carbon isotope values can be confidently correlated over the Mediterranean Tethys which is the sole area where a detailed isotopic record is available for the entire Barremian (Erba et al., 1999; Wissler et al., 2002). These lines of evidence concur to define the MBE as an outstanding event associated with large scale changes in the ocean-climate system likely related to the rapid oceanic Ontong-Java Plateau formation, which eventually led to OAE1a. Remarkably, the MBE largely predates the well known series of biotic and geochemical events occurring prior to the OAE1a and may be considered as the real turning point in the Barremian-Aptian long-term cycle of black-shale deposition and evolutionary turnovers in several fossil groups. References Erba, E., Channell, J.E.T., Claps, M., Jones, C., Larson, R

  4. Desorption mass spectrometry: Revisiting the in-situ calibration technique for mixed group-V alloy MBE growth of ~3.3 μm diode lasers

    NASA Astrophysics Data System (ADS)

    Kaspi, Ron; Lu, Chunte; Yang, Chi; Newell, Timothy C.; Luong, Sanh

    2015-09-01

    We apply the desorption mass spectrometry (DMS) technique and analyze the desorbed Sb species in-situ during MBE growth of mixed As/Sb heterostructures. We demonstrate how DMS is useful in pre-growth calibration of the V/III ratio, the group-III ratio, as well as the Sb-content in quaternary or quinary mixed As/Sb alloys. We also apply DMS to the digital alloy growth method. For demonstration purposes, we start with an un-calibrated MBE system, use the DMS technique to calibrate all of the previously undetermined MBE parameters and grow a ~3.3 μm diode laser heterostructure in only one attempt. The results demonstrate that the DMS technique will allow the MBE to quickly converge toward a set of acceptable growth parameters without the need for ex-situ calibration of alloy composition.

  5. Specific features of NH{sub 3} and plasma-assisted MBE in the fabrication of III-N HEMT heterostructures

    SciTech Connect

    Alexeev, A. N.; Krasovitsky, D. M.; Petrov, S. I.; Chaly, V. P.; Mamaev, V. V.; Sidorov, V. G.

    2015-01-15

    The specific features of how nitride HEMT heterostructures are produced by NH{sub 3} and plasma-assisted (PA) molecular-beam epitaxy (MBE) are considered. It is shown that the use of high-temperature AlN/AlGaN buffer layers grown with ammonia at extremely high temperatures (up to 1150°C) can drastically improve the structural perfection of the active GaN layers and reduce the dislocation density in these layers to values of 9 × 10{sup 8}−1 × 10{sup 9} cm{sup −2}. The use of buffer layers of this kind makes it possible to obtain high-quality GaN/AlGaN heterostructures by both methods. At the same time, in contrast to ammonia MBE which is difficult to apply at T < 500°C (because of the low efficiency of ammonia decomposition), PA MBE is rather effective at low temperatures, e.g., for the growth of InAlN layers lattice-matched with GaN. The results obtained in the MBE growth of AlN/AlGaN/GaN/InAlN heterostructures by both PA-MBE and NH{sub 3}-MBE with an extremely high ammonia flux are demonstrated.

  6. Cross-Sectional Study of Macrodefects in MBE Dual-Band HgCdTe on CdZnTe

    NASA Astrophysics Data System (ADS)

    Reddy, M.; Lofgreen, D. D.; Jones, K. A.; Peterson, J. M.; Radford, W. A.; Benson, J. D.; Johnson, S. M.

    2013-11-01

    HgCdTe dual-band mid-wave infrared/long-wave infrared focal-plane arrays on CdZnTe are a key component in advanced electrooptic sensor applications. Molecular beam epitaxy (MBE) has been used successfully for growth of dual-band layers on larger CdZnTe substrates. However, the macrodefect density, which is known to reduce the pixel operability and its run-to-run variation, is larger when compared with layers grown on Si substrate. This paper reports the macrodefect density versus size signature of a well-optimized MBE dual-band growth and a cross-sectional study of a macrodefect that represents the most prevalent class using focused ion beam, scanning transmission electron microscopy, and energy-dispersive x-ray spectroscopy. The results show that the macrodefect originates from a void, which in turn is associated with a pit on the CdZnTe substrate.

  7. High quality, hybrid-MBE growth of SrVO3 thin films

    NASA Astrophysics Data System (ADS)

    Moyer, Jarrett; Eaton, Craig; Engel-Herbert, Roman

    2013-03-01

    Vanadium-based transition metal oxides are an intriguing class of materials to study due to the metal-to-insulator (MIT) transitions that arise in many of the binary oxides (i.e. VO2, V2O3, V2O5) . The perovskite SrVO3 is metallic in bulk; however, it is possible to induce an MIT by modulating the bandwidth through strain or dimensional confinement. A mandatory requirement for controlling the electronic phase transition properties in material systems with strong correlation is the growth of high quality, stoichiometric thin films. This is demonstrated here with the growth of SrVO3 on LSAT (001) substrates using a hybrid-MBE technique, where the Sr is evaporated from an effusion cell and the V is provided through the metal-organic precursor vanadium oxo-tri-isopropoxide (VTIP). The structural properties of films with varying VTIP:Sr ratios are characterized by RHEED, XRD, AFM and TEM. These measurements demonstrate that SrVO3 can be grown with excellent structural quality, atomically flat surfaces and rocking curves of the same width as the substrate, accomplishing a necessary first step in controlling the MIT in SrVO3. This research is primarily supported by ONR Grant N00014-11-1-0665

  8. IMPORTANCE OF IN SITU MONITORS IN THE PREPARATION OF LAYERED OXIDE HETEROSTRUCTURES BY REACTIVE MBE.

    SciTech Connect

    Schlom, Darrell G.; Haeni, J. H.; Theis, C. D.; Tian, W.; Pan, X. Q.; Brown, G. W.; Hawley, M. E.

    2001-01-01

    Using a variety of in situ monitors and when possible adsorption-controlled growth conditions, layered oxide heterostructures including new compounds and metastable superlattices have been grown by reactive molecular beam epitaxy (MBE). The heteroepitaxial layers grown include Bi{sub 4}Ti{sub 3}O{sub 12}-SrTiO{sub 3} and Bi{sub 4}Ti{sub 3}O{sub 12}-PbTiO{sub 3} Aurivillius phases, Sr{sub n+1}Ti{sub n}O{sub 3n+1} Ruddlesden-Popper phases, and metastable PbTiO{sub 3}/SrTiO{sub 3} and BaTiO{sub 3}/SrTiO{sub 3} superlattices. Accurate composition control is key to the controlled growth of such structures, and to this end combinations of reflection high-energy electron diffraction (RHEED), atomic absorption spectroscopy (AA), a quartz crystal microbalance (QCM), and adsorption-controlled growth conditions were employed during growth. The structural perfection of the films has been investigated using in situ RHEED, four-circle x-ray diffraction, atomic force microscopy (AFM), and high-resolution transmission electron microscopy (TEM).

  9. MBE fabrication of self-assembled Si and metal nanostructures on Si surfaces

    SciTech Connect

    Galiana, Natalia; Martin, Pedro-Pablo; Munuera, Carmen; Varela del Arco, Maria; Soria, Federico; Ocal, Carmen; Ruiz, Ana; Alonso, Maria

    2006-01-01

    Two types of fairly regular distributions of Si nanostructures, of interest as templates to grow spatially controlled ensembles of metal (Co, Fe, Ag, etc.) nanostructures, are presented in this paper. Both of them are achieved by self-assembling processes during Si homoepitaxy. One corresponds to films grown by molecular beam epitaxy (MBE) on Si(0 0 1)-2 x 1 surfaces with low (<1 degree) miscut angles. In this case, arrays of 3D Si-islands displaying well defined pyramid-like shapes can be obtained, as evidenced by Scanning Force Microscopy (SFM) and Scanning Transmission Electron Microscopy (STEM). Such arrays exhibit strong similarities with those reported for Ge and SiGe islands on Si(0 0 1), and may thus serve as a simpler route to produce ordered distributions of metallic nanodots. On the other hand, on Si(1 1 1)-7 x 7 vicinal substrates misoriented 4 degrees toward the View the MathML source direction, step rearrangement during homoepitaxy permits to produce nanopatterned surfaces, the building-blocks of which are triangular (1 1 1) platforms, with lateral dimensions of hundreds of nanometers, bound by step bunches about 30 nm high. Furthermore, different Ag deposition experiments support this spontaneous patterning on Si(1 1 1) as a promising approach to achieve regular distributions of metallic nanocrystals with an overall homogeneity in sizes, shapes and spacing.

  10. Ga-assisted MBE growth of GaAs nanowires using thin HSQ layer

    NASA Astrophysics Data System (ADS)

    Rieger, Torsten; Heiderich, Sonja; Lenk, Steffi; Lepsa, Mihail Ion; Grützmacher, Detlev

    2012-08-01

    We present detailed results about the molecular beam epitaxy (MBE) growth of GaAs nanowires (NWs) on GaAs (111)B substrates prepared for the growth by a new method using hydrogen silsesquioxane (HSQ). Before the growth, HSQ is converted to SiOx by thermal treatment. The NWs are grown via the vapor-liquid-solid (VLS) mechanism. The influence of five growth parameters are described: SiOx thickness, growth time, substrate temperature and Ga and As4 beam fluxes. It is shown that the nanowire density can be tuned by two orders of magnitude by adjusting the SiOx thickness. Additionally, the results demonstrate that the axial growth is controlled by the As4 beam flux whereas the lateral growth is controlled by the Ga beam flux. The observed NW tapering is mainly determined by the V/III beam flux ratio. Our study gives important information about the VLS growth mechanism, which is extended by considering the secondary adsorption process of Ga adatoms. The nanowires have predominantly zinc blende crystal structure with rotational twins. A wurtzite segment is always found at the top of the NWs being associated with the growth after the Ga shutter has been closed.

  11. MBE growth of topological insulator Bi2Se3 and Bi2Te3 films

    NASA Astrophysics Data System (ADS)

    Zhang, Tong; Levy, Niv; Song, Young Jae; Chae, Jungseok; Stroscio, Joseph A.

    2011-03-01

    Three-dimensional (3D) topological insulators are a new state of quantum matter with a band gap in bulk but gapless states on the surface. The surface states with spin helicity can be the host of many striking quantum phenomena. In this work, we use ultrahigh vacuum molecular beam epitaxy to grow atomically flat topological insulator (TI) Bi2Se3 and Bi2Te3 films. High quality TI films were obtained using epitaxial graphene on SiC as a substrate for TI growth. The growth dynamics was characterized by real time reflection high-energy electron diffraction (RHEED). The growth condition was optimized by adjusting for proper flux rate and substrate temperature while monitoring the RHEED patterns. In situ Auger spectroscopy and scanning tunneling microscopy (STM) measurements at 5K are used to study the as-grown films for their stoichiometry and defect density. We expect these MBE grown samples will provide a good candidate for studying the topological surface states and related phenomena, which will be studied using scanning tunneling spectroscopy at millikelvin temperatures

  12. Group III-nitride thin films grown using MBE and bismuth

    DOEpatents

    Kisielowski, Christian K.; Rubin, Michael

    2002-01-01

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  13. Group III-nitride thin films grown using MBE and bismuth

    DOEpatents

    Kisielowski, Christian K.; Rubin, Michael

    2000-01-01

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  14. MBE growth of active regions for electrically pumped, cw-operating GaSb-based VCSELs

    NASA Astrophysics Data System (ADS)

    Kashani-Shirazi, K.; Bachmann, A.; Boehm, G.; Ziegler, S.; Amann, M.-C.

    2009-03-01

    Electrically pumped, cw-operating, single-mode GaSb-based VCSELs are attractive light sources for trace-gas sensing systems using tunable diode laser absorption spectroscopy (TDLAS) [A. Vicet, D.A. Yarekha, A. Pérona, Y. Rouillard, S. Gaillard, Spectrochimica Acta Part A 58 (2002) 2405-2412]. Only recently, the first electrically pumped (EP) devices emitting at 2.325 μm in cw-mode at room temperature have been reported [A. Bachmann, T. Lim, K. Kashani-Shirazi, O. Dier, C. Lauer, M.-C. Amann, Electronics Letters 44(3) (2008) 202-203]. The fabrication of these devices employs the molecular beam epitaxy (MBE) growth of GaSb/AlAsSb-distributed Bragg mirrors, a multi-quantum-well active region made of AlGaAsSb/InGaAsSb and an InAsSb/GaSb-buried-tunnel junction. As VCSELs are usually driven under high injection rates, an optimum electrical design of active regions is essential for high-performance devices. In this paper we present an enhanced simulation of current flow in the active region under operation conditions. The calculation includes carrier transport by drift, diffusion and tunneling. We discuss different design criteria and material compositions for active regions. Active regions with various barrier materials were incorporated into edge emitter samples to evaluate their performance. Aluminum-containing barriers show better internal efficiency compared to active regions with GaSb as the barrier material.

  15. MCT by MBE on GaAs at AIM: state of the art and roadmap

    NASA Astrophysics Data System (ADS)

    Figgemeier, Heinrich; Wenisch, Jan; Eich, Detlef; Hanna, Stefan; Schirmacher, Wilhelm; Lutz, Holger; Schallenberg, Timo; Breiter, Rainer

    2015-06-01

    In multiple publications over the last years, MCT MBE on GaAs has been shown to be a very versatile and promising material system and indeed may be the prime candidate among the alternative substrates for the fabrication of high-performance detectors across the whole IR composition range. In this paper we report on successful growth of MCT on GaAs over the composition range 0.2 < x(Cd) < 0.8. A single color MWIR 640 × 512, 15 μm pitch detector fabricated from this material with an operability of 99.71% at an operating temperature of 120 K is presented. In the LWIR region, an operability of 99.48% at 65 K has been achieved with a 1280 × 1024, 15 μm pitch detector. Finally we report on preliminary results of a dual-color 640 × 512, 20 μm pitch detector with cutoff wavelengths in the 3 - 4 and 4 - 5 μm range.

  16. MBE fabrication of self-assembled Si and metal nanostructures on Si surfaces

    NASA Astrophysics Data System (ADS)

    Galiana, Natalia; Martin, Pedro-Pablo; Munuera, Carmen; Varela, María; Soria, Federico; Ocal, Carmen; Ruiz, Ana; Alonso, María

    2006-09-01

    Two types of fairly regular distributions of Si nanostructures, of interest as templates to grow spatially controlled ensembles of metal (Co, Fe, Ag, etc.) nanostructures, are presented in this paper. Both of them are achieved by self-assembling processes during Si homoepitaxy. One corresponds to films grown by molecular beam epitaxy (MBE) on Si(0 0 1)-2 × 1 surfaces with low (<1°) miscut angles. In this case, arrays of 3D Si-islands displaying well defined pyramid-like shapes can be obtained, as evidenced by Scanning Force Microscopy (SFM) and Scanning Transmission Electron Microscopy (STEM). Such arrays exhibit strong similarities with those reported for Ge and SiGe islands on Si(0 0 1), and may thus serve as a simpler route to produce ordered distributions of metallic nanodots. On the other hand, on Si(1 1 1)-7 × 7 vicinal substrates misoriented 4° toward the [1 1 2¯] direction, step rearrangement during homoepitaxy permits to produce nanopatterned surfaces, the building-blocks of which are triangular (1 1 1) platforms, with lateral dimensions of hundreds of nanometers, bound by step bunches about 30 nm high. Furthermore, different Ag deposition experiments support this spontaneous patterning on Si(1 1 1) as a promising approach to achieve regular distributions of metallic nanocrystals with an overall homogeneity in sizes, shapes and spacing.

  17. Characterization of ZnSe homo-interface grown by MBE

    NASA Astrophysics Data System (ADS)

    Nakanishi, F.; Doi, H.; Yamada, T.; Matsuoka, T.; Nishine, S.; Matsumoto, K.; Shirakawa, T.

    1997-06-01

    A ZnSe homo-interface, which was formed by MBE, was characterized. First, when the unetched ZnSe substrates were used, 3D-nucleation occurred, which suggested the remnant of the heterogeneous nuclei. Consequently, the interface layer was clearly visible and as high as 10 8 cm -2 crystal defects, such as dislocations and stacking faults, were observed by cross sectional TEM. The EPD was uncountable at this high defect density. Second, when the substrates were chemically etched, 2D-nucleation was confirmed by RHEED, and interface layer and defects were not observed by cross sectional TEM. However plan-view TEM and EPD revealed that about 10 6-10 7 cm -2 crystal defects were observed. To clarify the origin of the crystal defects at the homo-interface, SIMS analysis was performed and the results showed the pile up of oxygen at the interface, and the EPD was proportional to the intensity of the O signal. Finally, the reduction of the oxide layer after the chemical etching was tried using various reagents. The reconstruction pattern of the RHEED was observed at lower temperatures using HCl solution and the EPD was lowered near the level of the ZnSe substrates, 10 4-10 5 cm -2

  18. MBE growth and characterization of TlInGaAsN double quantum well structures

    NASA Astrophysics Data System (ADS)

    Krishnamurthy, D.; Shanthi, S.; Kim, K. M.; Sakai, Y.; Ishimaru, M.; Hasegawa, S.; Asahi, H.

    2009-03-01

    In the pursuit of reducing the temperature dependence of the emission wavelengths of devices, TlInGaAsN double quantum well (DQW) structures with different barriers grown on GaAs substrates by molecular beam epitaxy (MBE) were investigated. Higher Tl incorporation, a key parameter to reduce temperature dependence, could be obtained in the TlGaAsN barrier samples. However, the presence of many dislocations and very rough interfaces together with phase separation reduced the photoluminescence (PL) characteristics. DQW structures with combined barriers of TlGaAsN+TlGaAs+TlGaAsN and those consisting of TlGaAsN with reduced N composition showed improved crystalline characteristics. The (2 2 4) reciprocal space maps of these two samples did not show any diffraction corresponding to phase segregation. However, cross-sectional transmission electron microscopy (X-TEM) images revealed the presence of inhomogeneity (i.e., the presence of nearly perfect regions with good interfaces as well as regions with rough interfaces) in these samples.

  19. MBE grown III-V strain relaxed buffer layers and superlattices characterized by atomic force microscopy

    SciTech Connect

    Howard, A.J.; Fritz, I.J.; Drummond, T.J.; Olsen, J.A.; Hammons, B.E.; Kurtz, S.R.; Brennan, T.M.

    1993-11-01

    Using atomic force microscopy (AFM), the authors have investigated the effects of growth temperature and dopant incorporation on the surface morphology of MBE grown graded buffer layers and strained layer superlattices (SLSs) in the InGaAlAs/GaAs and InAsSb/InSb material systems. The AFM results show quantitatively that over the temperature range from 380 to 545 C, graded in{sub x}Al{sub 1{minus}x}As(x = 0.05 {minus} 0.32) buffer layers grown at high temperatures ({approximately}520 C), and graded In{sub x}Ga{sub 1{minus}x}As (x = 0.05 {minus} 0.33) buffer layers and In{sub 0.4}Ga{sub 0.6}As/In{sub 0.26}Al{sub 0.35}Ga{sub 0.39}As SLSs grown at low temperatures ({approximately}400 C) have the lowest RMS roughness. Also, for SLSs InAs{sub 0.21}Sb{sub 0.79}/InSb, undoped layers grown at 470 C were smoother than undoped layers grown at 420 C and Be-doped layers grown at 470 C. These results illustrate the role of surface tension in the growth of strained layer materials near the melting temperature of the InAs{sub x}Sb{sub {minus}x}/InSb superlattice. Nomarski interference and transmission electron microscopies, IR photoluminescence, x-ray diffraction, and photocurrent spectroscopy were also used to evaluate the relative quality of the material but usually, the results were not conclusive.

  20. An Investigation into the Admittance of MIS-Structures Based on MBE HgCdTe with Quantum Wells

    NASA Astrophysics Data System (ADS)

    Dzyadukh, S. M.; Voitsekhovskii, A. V.; Nesmelov, S. N.; Dvoretskii, S. A.; N. Mikhailov, N.; Gorn, D. I.

    2013-12-01

    The results of investigations into the complex admittance of the MIS-structures based on heteroepitaxial MBE Hg1- x Cd x Te with quantum wells (QW) in the test-signal frequency range 1 kHz - 2 МHz at temperatures 8-300 K are reported. The thickness of single HgTe QWs was 5.6 and 7.1 nm, the content in the 35-nm thick barrier layers - 0.65 and 0.62, respectively.

  1. Multi-source MBE with high-precision rate control system as a synthesis method sui generis for multi-cation metal oxides

    NASA Astrophysics Data System (ADS)

    Yamamoto, Hideki; Krockenberger, Yoshiharu; Naito, Michio

    2013-09-01

    Molecular beam epitaxy (MBE) has been an excellent tool to design artificial heterostructures in the research field of semiconductors by means of an alternate stacking of existing lattices. This article describes further capabilities of MBE as a synthesis tool sui generis, especially for multi-cation oxides, due to low-temperature reaction and the pseudomorphic stabilization effect by epitaxy. Single-crystalline Sr0.9La0.1CuO2 films exhibiting metallic conduction and superconductivity are successfully prepared by MBE. A new phase, T*-La2CuO4, is also stabilized on a DyScO3 substrate. Methods of high-precision rate control of each constituent element, which is prerequisite for a reproducible growth of the multi-cation oxide films, are also discussed.

  2. Self-regulating MBE growth of stoichiometric BaSnO3 films via reactive radical mechanism

    NASA Astrophysics Data System (ADS)

    Prakash, Abhinav; Dewey, John; Yun, Hwanhui; Jeong, Jong Seok; Mkhoyan, K. Andre; Jalan, Bharat

    Growth of thin films comprising of element with low oxidation potential such as Sn often requires reactive oxidants such as ozone or high-pressure oxygen plasma. By utilizing the chemistry of highly reactive radical of Sn, we will present on the growth of phase-pure, epitaxial BaSnO3 films using a hybrid molecular beam epitaxy (MBE) approach with scalable growth rates. The notable finding was that Sn radicals are very reactive to yield phase-pure BaSnO3 films even in molecular oxygen. In this approach, we use hexamethylditin (HMDT) as a tin source, a solid effusion cell for Ba and either molecular oxygen or an rf oxygen plasma source. Phase-pure BaSnO3 films were grown at 900 0C, and oxygen pressure of 5x10-6 Torr as a function Sn:Ba ratio. In-situ time-dependent RHEED intensity oscillations were observed establishing a layer-by-layer growth mode and a critical thickness of ~1 nm for strain relaxation. Rutherford backscattering spectrometry and lattice constant determined using high-resolution X-ray diffraction was used to optimize cation stoichiometry. ``MBE growth window'' was identified where films show bulk-like lattice parameter (4.116 Å) over a wide-range of cation flux ratios. A correlation between RHEED patterns, stoichiometry, and surface morphology was established This work is supported primarily by NSF (DMR-1410888).

  3. Investigation of Substrate Effects on Interface Strain and Defect Generation in MBE-Grown HgCdTe

    NASA Astrophysics Data System (ADS)

    Gu, R.; Lei, W.; Antoszewski, J.; Faraone, L.

    2016-05-01

    Si, Ge, and GaAs have been extensively investigated as alternative substrates for molecular-beam epitaxy (MBE) growth of HgCdTe and, at present, are widely used for HgCdTe-based infrared focal-plane arrays. However, the problem of high dislocation density in HgCdTe layers grown on these lattice-mismatched substrates has yet to be resolved. In this work, we investigated another alternative substrate, GaSb, which has a significantly smaller lattice mismatch with HgCdTe in comparison with Si, Ge, and GaAs, and is readily available as large-area, epiready wafers at much lower cost in comparison with lattice-matched CdZnTe substrates. The resultant stress due to lattice and thermal mismatch between the HgCdTe epilayer and various substrates has been calculated in this work using the elasticity matrix, and the corresponding stress distribution simulated using ANSYS. The simulated structures were matched by experimental samples involving MBE growth of HgCdTe on GaAs, GaSb, and CdZnTe substrates, and were characterized via reflection high-energy electron diffraction and x-ray diffraction analysis, followed by etch pit density (EPD) analysis. In comparison with other alternative substrates, GaSb is shown to have lower interface stress and lower EPD, rendering it an interesting and promising alternative substrate material for HgCdTe epitaxy.

  4. MBE-Grown CdTe Layers on GaAs with In-assisted Thermal Deoxidation

    NASA Astrophysics Data System (ADS)

    Arı, Ozan; Bilgilisoy, Elif; Ozceri, Elif; Selamet, Yusuf

    2016-03-01

    Molecular beam epitaxy (MBE) growth of thin (˜2 μm) CdTe layers characterized by high crystal quality and low defect density on lattice mismatched substrates, such as GaAs and Si, has thus far been difficult to achieve. In this work, we report the effects of in situ thermal deoxidation under In and As4 overpressure prior to the CdTe growth on epiready GaAs(211)B wafers, aiming to enhance CdTe crystal quality. Thermally deoxidized GaAs samples were analyzed using in situ reflection high energy electron diffraction, along with ex situ x-ray photo-electron spectroscopy (XPS) and atomic force microscopy. MBE-grown CdTe layers were characterized using x-ray diffraction (XRD) and Everson-type wet chemical defect decoration etching. We found that In-assisted desorption allowed for easier surface preparation and resulted in a smoother surface compared to As-assisted surface preparation. By applying In-assisted thermal deoxidation to GaAs substrates prior to the CdTe growth, we have obtained single crystal CdTe films with a CdTe(422) XRD rocking curve with a full-width half-maximum value of 130.8 arc-s and etch pit density of 4 × 106 cm-2 for 2.54 μm thickness. We confirmed, by XPS analysis, no In contamination on the thermally deoxidized surface.

  5. Investigation of Substrate Effects on Interface Strain and Defect Generation in MBE-Grown HgCdTe

    NASA Astrophysics Data System (ADS)

    Gu, R.; Lei, W.; Antoszewski, J.; Faraone, L.

    2016-09-01

    Si, Ge, and GaAs have been extensively investigated as alternative substrates for molecular-beam epitaxy (MBE) growth of HgCdTe and, at present, are widely used for HgCdTe-based infrared focal-plane arrays. However, the problem of high dislocation density in HgCdTe layers grown on these lattice-mismatched substrates has yet to be resolved. In this work, we investigated another alternative substrate, GaSb, which has a significantly smaller lattice mismatch with HgCdTe in comparison with Si, Ge, and GaAs, and is readily available as large-area, epiready wafers at much lower cost in comparison with lattice-matched CdZnTe substrates. The resultant stress due to lattice and thermal mismatch between the HgCdTe epilayer and various substrates has been calculated in this work using the elasticity matrix, and the corresponding stress distribution simulated using ANSYS. The simulated structures were matched by experimental samples involving MBE growth of HgCdTe on GaAs, GaSb, and CdZnTe substrates, and were characterized via reflection high-energy electron diffraction and x-ray diffraction analysis, followed by etch pit density (EPD) analysis. In comparison with other alternative substrates, GaSb is shown to have lower interface stress and lower EPD, rendering it an interesting and promising alternative substrate material for HgCdTe epitaxy.

  6. 40 CFR 33.210 - Does an entity certified as an MBE or WBE by EPA need to keep EPA informed of any changes which...

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 40 Protection of Environment 1 2010-07-01 2010-07-01 false Does an entity certified as an MBE or....210 Section 33.210 Protection of Environment ENVIRONMENTAL PROTECTION AGENCY GRANTS AND OTHER FEDERAL ASSISTANCE PARTICIPATION BY DISADVANTAGED BUSINESS ENTERPRISES IN UNITED STATES ENVIRONMENTAL...

  7. Molecular beam epitaxy (MBE) growth of rare earth doped gallium nitride for laser diode application

    NASA Astrophysics Data System (ADS)

    Park, Jeongho

    The goal of this dissertation is to demonstrate the visible laser emission from rare earth doped GaN grown on sapphire and silicon substrate. The research presented in this dissertation focused on exploration of RE's physics and laser characteristics and investigating site selective laser emission. In this study, the first visible (red) lasing emission from Eu-doped GaN thin films grown on sapphire substrates was demonstrated. The edge emission fulfills the requirements of stimulated emission properties: super-linear characteristic, spectrum line narrowing, polarization effect, lifetime reduction, and longitudinal modes in a Fabry-Perot cavity. The GaN:Eu active layer has low threshold (˜10kW/cm2) for the onset of lasing. The optical gain and loss are of the order of 50 and 20cm-1, respectively. Growth conditions are investigated for gain enhancement and loss reduction. To obtain the high gain and low loss active layer, N-rich growth conditions are required. Channel waveguide cavities result in 5x increases in gain value compared to planar waveguides. To utilize the performance and flexibility of silicon microelectronics, we used silicon (111) substrate, which incorporated several AlGaN and AIN thin films as buffer, strain compensation and bottom optical cladding layers. With this substrate, we developed the laser structure emitting visible wavelength. We have utilized Eu-doped GaN for the active medium within a structure consisting of a top cladding AlGaN layers grown by MBE on a Si substrate. Stimulated emission (SE) was obtained at room temperature from Eu3+ at 620nm, with a threshold of ˜117kW/cm 2. Values of modal gain and loss of ˜100 and 46 cm-1 were measured. This demonstration indicates that utilizing rare earths a range of lasers on Si can be obtained, covering the UV, visible and IR regions, thus enabling a significant expansion of optoelectronic and microelectronic integration. The dependence of optical modal gain and loss on GaN:Eu growth

  8. Laser-MBE of nickel nanowires using AAO template: a new active substrate of surface enhanced Raman scattering.

    PubMed

    Zhang, Lisheng; Fang, Yan; Zhang, Pengxiang

    2008-01-01

    The highly ordered anodic aluminum oxide (AAO) template was fabricated using aluminum anodizing in electrolytes with two-step method, which apertures were about 50-80nm. The nickel nanowires with about 40-70nm in diameter was prepared on the AAO template by laser-MBE (molecular beam epitaxy). And high quality Raman spectra of SudanII were obtained on the glass covered with the nickel nanowires. On the nickel nanowires there are both surface enhanced Raman scattering (SERS) and tip enhanced Raman scattering (TERS). The new observations not only enlarge the range of SERS applications, but also imply a possible new enhancement mechanism. Otherwise the Raman and SERS frequencies of SudanII molecule were calculated using, respectively, DFT and B3PW91. PMID:17627875

  9. Epitaxial metallic β-Nb2N films grown by MBE on hexagonal SiC substrates

    NASA Astrophysics Data System (ADS)

    Katzer, D. Scott; Nepal, Neeraj; Meyer, David J.; Downey, Brian P.; Wheeler, Virginia D.; Storm, David F.; Hardy, Matthew T.

    2015-08-01

    RF-plasma MBE was used to epitaxially grow 4- to 100-nm-thick metallic β-Nb2N thin films on hexagonal SiC substrates. When the N/Nb flux ratios are greater than one, the most critical parameter for high-quality β-Nb2N is the substrate temperature. The X-ray characterization of films grown between 775 and 850 °C demonstrates β-Nb2N phase formation. The (0002) and (21\\bar{3}1) X-ray diffraction measurements of a β-Nb2N film grown at 850 °C reveal a 0.68% lattice mismatch to the 6H-SiC substrate. This suggests that β-Nb2N can be used for high-quality metal/semiconductor heterostructures that cannot be fabricated at present.

  10. X-ray Investigation of Ferromagnetic MnAs Thin Films Grown on GaAs(001) by MBE

    NASA Astrophysics Data System (ADS)

    Huang, S.; Ming, Z. H.; Soo, Y. L.; Kao, Y. H.; Tanaka, M.; Munekata, H.

    1996-03-01

    Quantitative characterization of the microstructures in epitaxial layers grown by MBE is essential for understanding the dynamical processes of epitaxy and surface morphology. In the present study, various x-ray techniques including grazing incidence x-ray scattering (GIXS), x-ray diffraction (XRD), and extended x-ray absorption fine structure (EXAFS) have been employed to investigate the microstructures of two MnAs thin films grown on GaAs(001) by using two different growth templates. The film structures are compared in terms of the interfacial roughness, lattice constants, epilayer thickness, local environment surrounding the Mn atoms, coordination number, and local disorder. These results provide quantitative evidence for the effects of template on the local structure and crystallinity of the MnAs films which can be correlated with the observed difference in their physical properties such as the easy magnetization direction, etc.. * Research is supported in part by DOE.

  11. Thermal Stability of Ge/GeSn Nanostructures Grown by MBE on (001) Si/Ge Virtual Wafers

    NASA Astrophysics Data System (ADS)

    Sadofyev, Yu. G.; Martovitsky, V. P.; Klekovkin, A. V.; Saraikin, V. V.; Vasil'evskii, I. S.

    A stack of five metastable 200-nm-thick elastically strained GeSn epitaxial layers separated by 20-nm-thick Ge spacers was grown on (001) Si/Ge virtual substrate by MBE. The molar fraction of Sn in different layers varied from 0.005 to 0.10, increasing with the layer distance from the Ge buffer. The phase separation of the GeSn alloy during postgrowth annealing takes place along with plastic relaxation. The phase separation begins well before the completion of the plastic relaxation process. The degree of phase separation at a given annealing temperature depends strongly on the Sn content in the GeSn alloy. The Sn released from the decomposed GeSn alloy predominantly accumulates as an amorphous layer on the surface of the sample.

  12. Polarized Raman spectroscopy of corrugated MBE grown GaAs (6¯3¯1¯) homoepitaxial films

    NASA Astrophysics Data System (ADS)

    Espinosa-Vega, L. I.; Rodriguez, A. G.; Cruz-Hernandez, E.; Martinez-Veliz, I.; Rojas-Ramirez, J.; Ramirez-Lopez, M.; Nieto-Navarro, J.; Lopez-Lopez, M.; Mendez-Garcia, V. H.

    2013-09-01

    In this work, we present a Raman scattering study of GaAs layers grown on (6¯3¯1¯)-oriented substrates by molecular beam epitaxy. A set of samples whose morphology sustained different corrugation order were grown by MBE by varying the growth parameters such as temperature and As/Ga flux ratio. We employed polarized Raman spectroscopy using the backscattering configurations Z(XX) Z¯, Z(XY) Z¯ and Z(YY)Z¯. According to the calculated dipole selection rules both TO and LO phonons are allowed for backscattering from a perfect GaAs (6¯3¯1¯) crystal, but with the intensity of the TO phonon much larger than that of the LO phonon. However, it is found that the selection rules differ for corrugated samples. Besides, the TO/LO phonon resonances intensity ratio and the LO peak asymmetry depend on the corrugation order of the samples.

  13. Nanoscale Probing of Local Electrical Characteristics on MBE-Grown Bi₂Te₃ Surfaces under Ambient Conditions.

    PubMed

    Macedo, Rita J; Harrison, Sara E; Dorofeeva, Tatiana S; Harris, James S; Kiehl, Richard A

    2015-07-01

    The local electrical characteristics on the surface of MBE-grown Bi2Te3 are probed under ambient conditions by conductive atomic force microscopy. Nanoscale mapping reveals a 10-100× enhancement in current at step-edges compared to that on terraces. Analysis of the local current-voltage characteristics indicates that the transport mechanism is similar for step-edges and terraces. Comparison of the results with those for control samples shows that the current enhancement is not a measurement artifact but instead is due to local differences in electronic properties. The likelihood of various possible mechanisms is discussed. The absence of enhancement at the step-edges for graphite terraces is consistent with the intriguing possibility that spin-orbit coupling and topological effects play a significant role in the step-edge current enhancement in Bi2Te3. PMID:26030139

  14. Characterization of MBE-grown InAlN/GaN heterostructure valence band offsets with varying In composition

    NASA Astrophysics Data System (ADS)

    Jiao, Wenyuan; Kong, Wei; Li, Jincheng; Collar, Kristen; Kim, Tong-Ho; Losurdo, Maria; Brown, April S.

    2016-03-01

    Angle-resolved X-ray photoelectron spectroscopy (XPS) is used in this work to experimentally determine the valence band offsets of molecular beam epitaxy (MBE)-grown InAlN/GaN heterostructures with varying indium composition. We find that the internal electric field resulting from polarization must be taken into account when analyzing the XPS data. Valence band offsets of 0.12 eV for In0.18Al0.82N, 0.15 eV for In0.17Al0.83N, and 0.23 eV for In0.098Al0.902N with GaN are obtained. The results show that a compositional-depended bowing parameter is needed in order to estimate the valence band energies of InAlN as a function of composition in relation to those of the binary endpoints, AlN and InN.

  15. Possibilities for LWIR detectors using MBE-grown Si(/Si(1-x)Ge(x) structures

    NASA Technical Reports Server (NTRS)

    Hauenstein, Robert J.; Miles, Richard H.; Young, Mary H.

    1990-01-01

    Traditionally, long wavelength infrared (LWIR) detection in Si-based structures has involved either extrinsic Si or Si/metal Schottky barrier devices. Molecular beam epitaxially (MBE) grown Si and Si/Si(1-x)Ge(x) heterostructures offer new possibilities for LWIR detection, including sensors based on intersubband transitions as well as improved conventional devices. The improvement in doping profile control of MBE in comparison with conventional chemical vapor deposited (CVD) Si films has resulted in the successful growth of extrinsic Si:Ga, blocked impurity-band conduction detectors. These structures exhibit a highly abrupt step change in dopant profile between detecting and blocking layers which is extremely difficult or impossible to achieve through conventional epitaxial growth techniques. Through alloying Si with Ge, Schottky barrier infrared detectors are possible, with barrier height values between those involving pure Si or Ge semiconducting materials alone. For both n-type and p-type structures, strain effects can split the band edges, thereby splitting the Schottky threshold and altering the spectral response. Measurements of photoresponse of n-type Au/Si(1-x)Ge(x) Schottky barriers demonstrate this effect. For intersubband multiquntum well (MQW) LWIR detection, Si(1-x)Ge(x)/Si detectors grown on Si substrates promise comparable absorption coefficients to that of the Ga(Al)As system while in addition offering the fundamental advantage of response to normally incident light as well as the practical advantage of Si-compatibility. Researchers grew Si(1-x)Ge(x)/Si MQW structures aimed at sensitivity to IR in the 8 to 12 micron region and longer, guided by recent theoretical work. Preliminary measurements of n- and p-type Si(1-x)Ge(x)/Si MQW structures are given.

  16. High Quality GaAs Growth by MBE on Si Using GeSi Buffers and Prospects for Space Photovoltaics

    NASA Technical Reports Server (NTRS)

    Carlin, J. A.; Ringel, S. A.; Fitzgerald, E. A.; Bulsara, M.

    2005-01-01

    III-V solar cells on Si substrates are of interest for space photovoltaics since this would combine high performance space cells with a strong, lightweight and inexpensive substrate. However, the primary obstacles blocking III-V/Si cells from achieving high performance to date have been fundamental materials incompatabilities, namely the 4% lattice mismatch between GaAs and Si, and the large mismatch in thermal expansion coefficient. In this paper, we report on the molecular beam epitaxial (MBE) growth and properties of GaAs layers and single junction GaAs cells on Si wafers which utilize compositionally graded GeSi Intermediate buffers grown by ultra-high vacuum chemical vapor deposition (UHVCVD) to mitigate the large lattice mismatch between GaAs and Si. Ga As cell structures were found to incorporate a threading dislocation density of 0.9-1.5 x 10 (exp 6) per square centimeter, identical to the underlying relaxed Ge cap of the graded buffer, via a combination of transmission electron microscopy, electron beam induced current, and etch pit density measurements. AlGaAs/GaAs double heterostructures wre grown on the GeSi/Si substrates for time-resolved photoluminescence measurements, which revealed a bulk GaAs minority carrier lifetime in excess of 10 ns, the highest lifetime ever reported for GaAs on Si. A series of growth were performed to ass3ss the impact of a GaAs buffer to a thickness of only 0.1 micrometer. Secondary ion mass spectroscopy studies revealed that there is negligible cross diffusion of Ga, As and Ge at he III-V/Ge interface, identical to our earlier findings for GaAs grown on Ge wafers using MBE. This indicates that there is no need for a buffer to "bury" regions of high autodopjing,a nd that either pn or np configuration cells are easily accomodated by these substrates. Preliminary diodes and single junction Al Ga As heteroface cells were grown and fabricated on the Ge/GeSi/Si substrates for the first time. Diodes fabricated on GaAs, Ge and Ge

  17. A new approach to epitaxially grow high-quality GaN films on Si substrates: the combination of MBE and PLD

    PubMed Central

    Wang, Wenliang; Wang, Haiyan; Yang, Weijia; Zhu, Yunnong; Li, Guoqiang

    2016-01-01

    High-quality GaN epitaxial films have been grown on Si substrates with Al buffer layer by the combination of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) technologies. MBE is used to grow Al buffer layer at first, and then PLD is deployed to grow GaN epitaxial films on the Al buffer layer. The surface morphology, crystalline quality, and interfacial property of as-grown GaN epitaxial films on Si substrates are studied systematically. The as-grown ~300 nm-thick GaN epitaxial films grown at 850 °C with ~30 nm-thick Al buffer layer on Si substrates show high crystalline quality with the full-width at half-maximum (FWHM) for GaN(0002) and GaN(102) X-ray rocking curves of 0.45° and 0.61°, respectively; very flat GaN surface with the root-mean-square surface roughness of 2.5 nm; as well as the sharp and abrupt GaN/AlGaN/Al/Si hetero-interfaces. Furthermore, the corresponding growth mechanism of GaN epitaxial films grown on Si substrates with Al buffer layer by the combination of MBE and PLD is hence studied in depth. This work provides a novel and simple approach for the epitaxial growth of high-quality GaN epitaxial films on Si substrates. PMID:27101930

  18. A new approach to epitaxially grow high-quality GaN films on Si substrates: the combination of MBE and PLD.

    PubMed

    Wang, Wenliang; Wang, Haiyan; Yang, Weijia; Zhu, Yunnong; Li, Guoqiang

    2016-01-01

    High-quality GaN epitaxial films have been grown on Si substrates with Al buffer layer by the combination of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) technologies. MBE is used to grow Al buffer layer at first, and then PLD is deployed to grow GaN epitaxial films on the Al buffer layer. The surface morphology, crystalline quality, and interfacial property of as-grown GaN epitaxial films on Si substrates are studied systematically. The as-grown ~300 nm-thick GaN epitaxial films grown at 850 °C with ~30 nm-thick Al buffer layer on Si substrates show high crystalline quality with the full-width at half-maximum (FWHM) for GaN(0002) and GaN(102) X-ray rocking curves of 0.45° and 0.61°, respectively; very flat GaN surface with the root-mean-square surface roughness of 2.5 nm; as well as the sharp and abrupt GaN/AlGaN/Al/Si hetero-interfaces. Furthermore, the corresponding growth mechanism of GaN epitaxial films grown on Si substrates with Al buffer layer by the combination of MBE and PLD is hence studied in depth. This work provides a novel and simple approach for the epitaxial growth of high-quality GaN epitaxial films on Si substrates. PMID:27101930

  19. A new approach to epitaxially grow high-quality GaN films on Si substrates: the combination of MBE and PLD

    NASA Astrophysics Data System (ADS)

    Wang, Wenliang; Wang, Haiyan; Yang, Weijia; Zhu, Yunnong; Li, Guoqiang

    2016-04-01

    High-quality GaN epitaxial films have been grown on Si substrates with Al buffer layer by the combination of molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) technologies. MBE is used to grow Al buffer layer at first, and then PLD is deployed to grow GaN epitaxial films on the Al buffer layer. The surface morphology, crystalline quality, and interfacial property of as-grown GaN epitaxial films on Si substrates are studied systematically. The as-grown ~300 nm-thick GaN epitaxial films grown at 850 °C with ~30 nm-thick Al buffer layer on Si substrates show high crystalline quality with the full-width at half-maximum (FWHM) for GaN(0002) and GaN(102) X-ray rocking curves of 0.45° and 0.61°, respectively; very flat GaN surface with the root-mean-square surface roughness of 2.5 nm as well as the sharp and abrupt GaN/AlGaN/Al/Si hetero-interfaces. Furthermore, the corresponding growth mechanism of GaN epitaxial films grown on Si substrates with Al buffer layer by the combination of MBE and PLD is hence studied in depth. This work provides a novel and simple approach for the epitaxial growth of high-quality GaN epitaxial films on Si substrates.

  20. Vanadium dioxide thin films prepared on silicon by low temperature MBE growth and ex-situ annealing

    NASA Astrophysics Data System (ADS)

    Homm, Pia; van Bilzen, Bart; Menghini, Mariela; Locquet, Jean-Pierre; Ivanova, Todora; Sanchez, Luis; Sanchis, Pablo

    Vanadium dioxide (VO2) is a material that shows an insulator to metal transition (IMT) near room temperature. This property can be exploited for applications in field effect devices, electro-optical switches and nonlinear circuit components. We have prepared VO2 thin films on silicon wafers by combining a low temperature MBE growth with an ex-situ annealing at high temperature. We investigated the structural, electrical and optical characteristics of films with thicknesses ranging from 10 to 100 nm. We have also studied the influence of the substrate cleaning. The films grown with our method are polycrystalline with a preferred orientation in the (011) direction of the monoclinic phase. For the films produced on silicon with a native oxide, an IMT at around 75 °C is observed. The magnitude of the resistance change across the IMT decreases with thickness while the refractive index at room temperature corresponds with values reported in the literature for thin films. The successful growth of VO2 films on silicon with good electrical and optical properties is an important step towards the integration of VO2 in novel devices. The authors acknowledge financial support from the FWO project G052010N10 and EU-FP7 SITOGA project. PH acknowledges support from Becas Chile - CONICYT.

  1. Microstructures of InN film on 4H-SiC (0001) substrate grown by RF-MBE

    NASA Astrophysics Data System (ADS)

    Jantawongrit, P.; Sanorpim, S.; Yaguchi, H.; Orihara, M.; Limsuwan, P.

    2015-08-01

    InN film was grown on 4H-SiC (0001) substrate by RF plasma-assisted molecular beam epitaxy (RF-MBE). Prior to the growth of InN film, an InN buffer layer with a thickness of ∼5.5 nm was grown on the substrate. Surface morphology, microstructure and structural quality of InN film were investigated. Micro-structural defects, such as stacking faults and anti-phase domain in InN film were carefully investigated using transmission electron microscopy (TEM). The results show that a high density of line contrasts, parallel to the growth direction (c-axis), was clearly observed in the grown InN film. Dark field TEM images recorded with diffraction vectors g=11\\bar{2}0 and g = 0002 revealed that such line contrasts evolved from a coalescence of the adjacent misoriented islands during the initial stage of the InN nucleation on the substrate surface. This InN nucleation also led to a generation of anti-phase domains. Project supported by the Thailand Center of Excellence in Physics (ThEP) and the King Mongkut's University of Technology Thonburi under The National Research University Project. One of the authors (S. Sanorpim) was supported by the National Research Council of Thailand (NRCT) and the Thai Government Stimulus Package 2 (TKK2555), under the Project for Establishment of Comprehensive Center for Innovative Food, Health Products and Agriculture.

  2. Influence of Growth Parameters and Annealing on Properties of MBE Grown GaAsSbN SQWs

    NASA Technical Reports Server (NTRS)

    Wu, Liangjin; Iyer, Shanthi; Nunna, Kalyan; Bharatan, Sudhakar; Li, Jia; Collis, Ward J.

    2005-01-01

    In this paper we report the growth of GaAsSbN/GaAs single quantum well (SQW) heterostructures by molecular beam epitaxy (MBE) and their properties. A systematic study has been carried out to determine the effect of growth conditions, such as the source shutter opening sequence and substrate temperature, on the structural and optical properties of the layers. The substrate temperatures in the range of 450-470 C were found to be optimal. Simultaneous opening of the source shutters (SS) resulted in N incorporation almost independent of substrate temperature and Sb incorporation higher at lower substrate temperatures. The effects of ex-situ annealing in nitrogen ambient and in-situ annealing under As ovepressure on the optical properties of the layers have also been investigated. A significant increase in photoluminescence (PL) intensity with reduced full width at half maxima (FWHM) in conjunction with a blue shift in the emission energy was observed on 10 annealing the samples. In in-situ annealed samples, the PL line shapes were more symmetric and the temperature dependence of the PL peak energy indicated significant decrease in the exciton localization energy as exhibited by a less pronounced S-shaped curve. The inverted S-shaped curve observed in the temperature dependence of PL FWHM is also discussed. 1.61 micrometer emission with FWHM of 25 meV at 20K has been obtained in in-situ annealed GaAsSbN/GaAs SQW grown at 470 C by SS.

  3. Surface sulfurization on MBE-grown Cu(In1-x,Gax)Se2 thin films and devices

    NASA Astrophysics Data System (ADS)

    Khatri, Ishwor; Matsuyama, Isamu; Yamaguchi, Hiroshi; Fukai, Hirofumi; Nakada, Tokio

    2015-08-01

    Molecular beam epitaxy (MBE) grown Cu(In1-x,Gax)Se2 (CIGS) thin films were sulfurized at temperatures of 450-550 °C for 30 min in a 10% H2S-N2 mixture gas. The micro-roughness together with the S diffusion in the CIGS surfaces increased with increasing sulfurization temperature. Both near-band-edge PL intensity and decay time of the CIGS absorber layer enhanced after sulfurization. PL sub-peak around 80 meV below the main peak almost disappeared after sulfurization above 500 °C, which is expected due to the occupation of Se vacancies (Vse) with S. The open-circuit voltage (Voc), hence conversion efficiency, improved after sulfurization. The photovoltaic performance of the solar cells was consistent with PL intensity. Moreover, it is found for the first time from the SIMS analysis that the Cu atoms were depleted at the surface of CIGS layer after sulfurization, which could result in the improved Voc.

  4. Preliminary report on the MBE-4, an experimental multiple-beam induction linear accelerator for heavy ions

    SciTech Connect

    Warwick, A.I.; Gough, D.E.; Meuth, H.

    1988-11-01

    A small-scale experimental accelerator called MBE-4 has been constructed to demonstrate the principle of a current-amplifying induction linac for multiple beams of heavy ions. Four beams of Cs{sup 1+}, initially at 200 keV and each with a current of 10 mA have been accelerated and amplified to a kinetic energy of 700 keV and currents of 90 mA apiece. Transverse focusing is achieved by means of electrostatic quadrupoles; longitudinally the current is amplified and the beam bunch is held together against the space charge forces by special time-dependent accelerating fields. We report on the methods developed for designing and implementing the accelerating pulses and on measurements of the transverse and longitudinal emittance of the accelerated beams. Current fluctuations and the longitudinal emittance are initially almost zero and increase as acceleration errors are accumulated. We discuss the final longitudinal emittance and the current fluctuations in the experiment in terms of their acceptability for a large heavy-ion-fusion driver. 17 refs., 23 figs., 3 tabs.

  5. MBE Grown In x Ga1- x N Thin Films with Bright Visible Emission Centered at 550 nm

    NASA Astrophysics Data System (ADS)

    Dasari, K.; Thapa, B.; Wang, J.; Wright, J.; Kaya, S.; Jadwisienczak, W. M.; Palai, R.

    2016-04-01

    The In x Ga1- x N thin films with indium content of x = 14-18 at.% were successfully grown by using molecular beam epitaxy (MBE) at high growth temperatures from 650°C to 800°C. In situ reflection high-energy electron diffraction (RHEED) of the In x Ga1- x N films confirmed the Stranski-Krastanov growth mode. X-ray diffraction (XRD) of the films confirmed their highly crystalline nature having c-axis orientation with a small fraction of secondary InN phase admixture. High-resolution cross-sectional scanning electron microscopy images showed two-dimensional epilayers growth with thickness of about ˜260 nm. The high growth temperature of In x Ga1- x N epilayers is found to be favorable to facilitate more GaN phase than InN phase. All the fundamental electronic states of In, Ga, and N were identified by x-ray photoelectron spectroscopy (XPS) and the indium composition has been calculated from the obtained XPS spectra with CASAXPS software. The composition calculations from XRD, XPS and photoluminescence closely match each other. The biaxial strain has been calculated and found to be increasing with the In content. Growing In x Ga1- x N at high temperatures resulted in the reduction in stress/strain which affects the radiative electron-hole pair recombination. The In x Ga1- x N film with lesser strain showed a brighter and stronger green emission than films with the larger built-in strain. A weak S-shaped near band edge emission profile confirms the relatively homogeneous distribution of indium.

  6. Structural, electronic and mechanical properties of alkaline earth metal oxides MO (M=Be, Mg, Ca, Sr, Ba)

    NASA Astrophysics Data System (ADS)

    Cinthia, A. Jemmy; Priyanga, G. Sudha; Rajeswarapalanichamy, R.; Iyakutti, K.

    2015-04-01

    The structural, electronic and mechanical properties of alkaline earth metal oxides MO (M=Be, Mg, Ca, Sr, Ba) in the cubic (B1, B2 and B3) phases and in the wurtzite (B4) phase are investigated using density functional theory calculations as implemented in VASP code. The lattice constants, cohesive energy, bulk modulus, band structures and the density of states are computed. The calculated lattice parameters are in good agreement with the experimental and the other available theoretical results. Electronic structure reveals that all the five alkaline earth metal oxides exhibit semiconducting behavior at zero pressure. The estimated band gaps for the stable wurtzite phase of BeO is 7.2 eV and for the stable cubic NaCl phases of MgO, CaO, SrO and BaO are 4.436 eV, 4.166 eV, 4.013 eV, and 2.274 eV respectively. A pressure induced structural phase transition occurs from wurtzite (B4) to NaCl (B1) phase in BeO at 112.1 GPa and from NaCl (B1) to CsCl (B2) phase in MgO at 514.9 GPa, in CaO at 61.3 GPa, in SrO at 42 GPa and in BaO at 14.5 GPa. The elastic constants are computed at zero and elevated pressures for the B4 and B1 phases for BeO and for the B1 and B2 phases in the case of the other oxides in order to investigate their mechanical stability, anisotropy and hardness. The sound velocities and the Debye temperatures are calculated for all the oxides using the computed elastic constants.

  7. Selectively doped GaAs/N-Al(0.3)Ga(0.7)As heterostructures grown by gas-source MBE

    NASA Astrophysics Data System (ADS)

    Ando, Hideyasu; Kondo, Kazuhiro; Ishikawa, Hideaki; Sasa, Shigehiko; Inata, Tsuguo

    1988-05-01

    Selectively doped GaAs/N-Al(0.3)Ga(0.7)As heterostructures with a 6 nm spacer layer have been grown for the first time by gas-source MBE using triethylgallium and triethylaluminum as group III sources, and metallic arsenic. A reasonably high two-dimensional electron gas (2DEG) mobility of 48,000 sq cm / Vs (77 K) with a sheet electron concentration of 6.8 x 10 to the 11th/sq cm was obtained at a substrate temperature of 580 C and an arsenic pressure of 0.00011.

  8. Arsenic-induced intensity oscillations in reflection high-energy electron diffraction measurements. [during MBE of GaAs and InAs

    NASA Technical Reports Server (NTRS)

    Lewis, B. F.; Fernandez, R.; Grunthaner, F. J.; Madhukar, A.

    1986-01-01

    A technique of arsenic-induced RHEED intensity oscillations has been used to accurately measure arsenic incorporation rates as a function of substrate temperature during the homoepitaxial growths of both GaAs and InAs by molecular beam epitaxy (MBE). Measurements were made at growth temperatures from 350 to 650 C and at arsenic fluxes of 0.1 to 10.0 monolayer/s. The method measures only the arsenic actually incorporated into the growing film and does not include the arsenic lost in splitting the arsenic tetramers or lost by evaporation from the sample.

  9. Comparison of low temperature photoluminescence of bulk MBE (Molecular Beam Epitaxy) grown AlGaAs and GaAs using a graphite generated dimer versus a standard tetramer arsenic group-V source

    SciTech Connect

    Brennan, T.M.; Hammons, B.E.; Smith, M.C.; Jones, E.D.

    1987-01-01

    The carbon concentrations in GaAs and AlGaAs grown by Molecular Beam Epitaxy (MBE) have been studied when a graphite generated dimeric arsenic species and a standard tetramer arsenic species are used as the group-V source. Photoluminescence and Van der Pauw-Hall measurements have been made to examine the material quality in reference to which arsenic species is used for film growth. Results indicate that a graphite crucible arrangement for the thermal cracking of As/sub 4/ produces significant carbon contamination and is unacceptable for the MBE growth of GaAs and AlGaAs. 15 refs., 3 figs.

  10. MBE (Molecular Beam Epitaxial) growth characterization and electronic device processing of HgCdTe, HgZnTe related heterojunctions and HgCdTe-CdTe superlattices

    NASA Astrophysics Data System (ADS)

    Faurie, Jean-Pierre

    1987-06-01

    As the MBE growth technique has continued to improve for Hg(1-x)Cd(x)Te films, the prospects for films of larger area have begun to be explored. These larger area films are important for imaging arrays and will be especially vital in the future for the efficient production of Hg(1-x)Cd(x)Te material. The growth of MBE of uniform Hg(1-x)Cd(x)Te epilayer on a large substrate is very difficult to achieve because of the non-uniform distribution of the fluxes and on the non-uniform temperature of the substrate.

  11. A low-temperature growth process of GaAs by electron-cyclotron-resonance plasma-excited molecular-beam-epitaxy (ECR-MBE)

    NASA Astrophysics Data System (ADS)

    Kondo, Naoto; Nanishi, Yasushi

    1988-09-01

    Taking advantage of plasma excitation, surface cleaning and growth process are realized at low temperatures by electron-cyclotron-resonance (ECR) plasma-excited molecular-beam-epitaxy (MBE). Prior to growth, substrates are cleaned by exposure to hydrogen plasma at temperatures ranging from 300 to 550°C. Arsine gas is introduced and cracked in an ECR plasma generation chamber. Gallium is supplied either as trimethylgallium (TMG) or as metallic Ga. Epitaxial films are successfully grown at substrate temperatures low as 430°C for the TMG-arsine system and 350°C for the metallic Ga-arsine system. The growth rate for the TMG-arsine system is found to be governed by a balance between TMG decomposition and surface atom desorption. By contrast, the metallic Ga-arsine system is only governed by the desorption process. Exposure to plasma is found to promote desorption of atoms migrating on the substrate surface. The interface between the substrate and the epitaxial layer produced by the ECR-MBE process is found to be clean without piling up of impurity.

  12. Investigation of p-side contact layers for II-VI compound semiconductor optical devices fabricated on InP substrates by MBE

    NASA Astrophysics Data System (ADS)

    Takamatsu, Shingo; Nomura, Ichirou; Shiraishi, Tomohiro; Kishino, Katsumi

    2015-09-01

    N-doped p-type ZnTe and ZnSeTe contact layers were investigated to evaluate which is more suitable for use in II-VI compound semiconductor optical devices on InP substrates. Contact resistances (Rc) between the contact layers and several electrode materials (Pd/Pt/Au, Pd/Au, and Au) were measured by the circular transmission line model (c-TLM) method using p-n diode samples grown on InP substrates by molecular beam epitaxy (MBE). The lowest Rc (6.5×10-5 Ω cm2) was obtained in the case of the ZnTe contact and Pd/Pt/Au electrode combination, which proves that the combination is suitable for obtaining low Rc. Yellow light-emitting diode devices with a ZnTe and ZnSeTe p-contact layer were fabricated by MBE to investigate the effect of different contact layers. The devices were characterized under direct current injections at room temperature. Yellow emission at around 600 nm was observed for each device. Higher emission intensity and lower slope resistance were obtained for the device with the ZnTe contact layer and Pd/Pt/Au electrode compared with other devices. These device performances are ascribed to the low Rc of the ZnTe contact and Pd/Pt/Au electrode combination.

  13. Recent Progress in MBE Growth of CdTe and HgCdTe on (211)B GaAs Substrates

    NASA Astrophysics Data System (ADS)

    Carmody, M.; Yulius, A.; Edwall, D.; Lee, D.; Piquette, E.; Jacobs, R.; Benson, D.; Stoltz, A.; Markunas, J.; Almeida, A.; Arias, J.

    2012-10-01

    Alternate substrates for molecular beam epitaxy growth of HgCdTe including Si, Ge, and GaAs have been under development for more than a decade. MBE growth of HgCdTe on GaAs substrates was pioneered by Teledyne Imaging Sensors (TIS) in the 1980s. However, recent improvements in the layer crystal quality including improvements in both the CdTe buffer layer and the HgCdTe layer growth have resulted in GaAs emerging as a strong candidate for replacement of bulk CdZnTe substrates for certain infrared imaging applications. In this paper the current state of the art in CdTe and HgCdTe MBE growth on (211)B GaAs and (211) Si at TIS is reviewed. Recent improvements in the CdTe buffer layer quality (double crystal rocking curve full-width at half-maximum ≈ 30 arcsec) with HgCdTe dislocation densities of ≤106 cm-2 are discussed and comparisons are made with historical HgCdTe on bulk CdZnTe and alternate substrate data at TIS. Material properties including the HgCdTe majority carrier mobility and dislocation density are presented as a function of the CdTe buffer layer quality.

  14. Growth and magnetic properties of zb-type MnAs films on GaAs substrates by high-temperature MBE

    NASA Astrophysics Data System (ADS)

    Kubo, K.; Kato, Y.; Kanai, K.; Ohta, J.; Fujioka, H.; Oshima, M.

    2008-10-01

    We have grown MnAs films on GaAs(1 1 1)B substrates by high-temperature molecular beam epitaxy (MBE) and have investigated their crystal structures and magnetic properties. X-ray diffraction (XRD) and grazing incidence X-ray diffraction (GIXD) results showed that two kinds of zb-type MnAs films with lattice constants of 5.73 and 5.96 Å were grown. The zb-type MnAs films show higher Curie temperature than 350 K and larger magnetization than the reported zb-type MnAs. At the initial stage of MnAs growth, Ga 1-xMn xAs was grown and this Ga 1-xMn xAs layer might play an important role of a buffer layer to enable the zb-MnAs growth.

  15. Hydrogen sulphide doping of GaAs and AlxGa1-xAs grown by molecular beam epitaxy (MBE)

    NASA Astrophysics Data System (ADS)

    Briones, F.; Golmayo, D.; González, L.; de Miguel, J. L.

    1985-03-01

    H2S gas has been used during molecular beam epitaxy (MBE) growth of GaAs and Al x Ga1- x As as sulphur vector for n-type doping. Doping efficiencies are less than 10-3 at usual growth temperatures, and are limited by an incorporation competitive surface process, probably 2Ga+H2S→Ga2S+H2. In AlxGa1- x As for x≧0.2 the doping efficiency is further reduced by carrier freeze-out at deep levels. Measured thermal activation energies depend on growth conditions and remain relatively low even up to the direct-indirect bandgap crossover for substrate temperatures in the 585 645 ‡C range.

  16. Effects of buffer layer and back-surface field on MBE-grown InGaAsP/InGaAs solar cells

    NASA Astrophysics Data System (ADS)

    Wu, Yuanyuan; Ji, Lian; Dai, Pai; Tan, Ming; Lu, Shulong; Yang, Hui

    2016-02-01

    Solid-state molecular beam epitaxy (MBE)-grown InGaAsP/InGaAs dual-junction solar cells on InP substrates are reported. An efficiency of 10.6% under 1-sun AM1.5 global light intensity is realized for the dual-junction solar cell, while the efficiencies of 16.4 and 12.3% are reached for the top InGaAsP and bottom InGaAs cells, respectively. The effects of the buffer layer and back-surface field on the performance of solar cells are discussed. High device performance is achieved in the case of a low concentration of oxygen and weak recombination when InGaAs buffers and InP back-surface field layers are used, respectively.

  17. Characterization of vertical Au/β-Ga2O3 single-crystal Schottky photodiodes with MBE-grown high-resistivity epitaxial layer

    NASA Astrophysics Data System (ADS)

    X, Z. Liu; C, Yue; C, T. Xia; W, L. Zhang

    2016-01-01

    High-resistivity β-Ga2O3 thin films were grown on Si-doped n-type conductive β-Ga2O3 single crystals by molecular beam epitaxy (MBE). Vertical-type Schottky diodes were fabricated, and the electrical properties of the Schottky diodes were studied in this letter. The ideality factor and the series resistance of the Schottky diodes were estimated to be about 1.4 and 4.6× 106 Ω. The ionized donor concentration and the spreading voltage in the Schottky diodes region are about 4 × 1018 cm-3 and 7.6 V, respectively. The ultra-violet (UV) photo-sensitivity of the Schottky diodes was demonstrated by a low-pressure mercury lamp illumination. A photoresponsivity of 1.8 A/W and an external quantum efficiency of 8.7 × 102% were observed at forward bias voltage of 3.8 V, the proper driving voltage of read-out integrated circuit for UV camera. The gain of the Schottky diode was attributed to the existence of a potential barrier in the i-n junction between the MBE-grown highly resistive β-Ga2O3 thin films and the n-type conductive β-Ga2O3 single-crystal substrate. Project supported by the National Nature Science Foundation of China (Grant No. 61223002) the Science and Technology Commission of Shanghai Municipality, China (Grant No. 13111103700), and the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No. 2012018530003).

  18. MBE growth of HgCdTe avalanche photodiode structures for low-noise 1.55 μm photodetection

    NASA Astrophysics Data System (ADS)

    de Lyon, T. J.; Baumgratz, B.; Chapman, G.; Gordon, E.; Hunter, A. T.; Jack, M.; Jensen, J. E.; Johnson, W.; Johs, B.; Kosai, K.; Larsen, W.; Olson, G. L.; Sen, M.; Walker, B.; Wu, O. K.

    1999-05-01

    Molecular-beam epitaxy (MBE) has been utilized to fabricate HgCdTe heterostructure separate absorption and multiplication avalanche photodiodes (SAM-APD) sensitive to infrared radiation in the 1.1-1.6 μm spectral range, as an alternative technology to existing III-V APD detectors. Device structures were grown on CdZnTe(211)B substrates using CdTe, Te, and Hg sources with in situ In and As doping. The composition of the HgCdTe alloy layers was adjusted to achieve both efficient absorption of IR radiation in the 1.1-1.6 μm spectral range and low excess-noise avalanche multiplication. The Hg 1- xCd xTe alloy composition in the gain region of the device, x=0.73, was selected to achieve equality between the bandgap energy and spin-orbit splitting to resonantly enhance the impact ionization of holes in the split-off valence band. The appropriate value of this alloy composition was determined from analysis of the 300 K bandgap and spin-orbit splitting energies of a set of calibration layers, using a combination of IR transmission and spectroscopic ellipsometry measurements. MBE-grown APD epitaxial wafers were processed into passivated mesa-type discrete device structures and diode mini-arrays using conventional HgCdTe process technology. Device spectral response, dark current density, and avalanche gain measurements were performed on the processed wafers. Avalanche gains in the range of 30-40 at reverse bias of 85-90 V and array-median dark current density below 2×10 -4 A/cm 2 at 40 V reverse bias have been demonstrated.

  19. Special Features of Admittance in Mis Structures Based on Graded-Gap MBE n-Hg1- x Cd x Te ( x = 0.31-0.32) in a Temperature Range OF 8-300 K

    NASA Astrophysics Data System (ADS)

    Voitsekhovskii, A. V.; Nesmelov, S. N.; Dzyadukh, S. M.; Vasil'ev, V. V.; Varavin, V. S.; Dvoretskii, S. A.; Mikhailov, N. N.; Kuz'min, V. D.; Remesnik, V. G.

    2014-09-01

    Admittance of MIS structures based on graded-gap n-Hg1- х Cd х Te ( x = 0.31-0.32) grown by molecular beam epitaxy (MBE) is investigated in a wide temperature range (8-300 K). It is shown that the temperature and frequency dependences of the differential resistance of space charge region for structures with a graded-gap layer are qualitatively similar to those for structures without a graded-gap layer. It is found that for MIS structures based on MBE n-Hg1- х Cd х Te ( x = 0.31-0.32), regardless of the presence of a graded-gap layer, the differential resistance of space charge region is limited by the processes of Shockley-Read generation in the temperature range of 25-100 K.

  20. Lattice-engineered MBE growth of high-indium mole fraction InGaAs for low cost MMICs and (1.3--1.55 {micro}m) OEICs

    SciTech Connect

    Childs, T.T.; Sokolov, V.; Sullivan, C.T.

    1997-11-01

    Using molecular beam epitaxy (MBE) and lattice engineering techniques, the feasibility of combining photonic devices applicable to the 1.3 to 1.55 {micro}m wavelength range and monolithic microwave (or mm-wave) integrated circuits (MMICs) on GaAs is demonstrated. A key factor in the MBE growth is incorporation of an InGaAs active layer having an indium arsenide mole fraction of 0.35 or greater and its lattice compatibility with the underlying semi-insulating GaAs substrate. The InGaAs layer used for the photonic devices, can also serve as the active channel for the high electron mobility transistors (HEMTs) for application in MMICs. Several examples of active and passive photonic devices grown by MBE are presented including an optical ridge waveguide, and a photodetector for detection of light in the 1.3 {micro}m range. The material structure includes a 3-layer AlGaAs/GaAs/AlGaAs optical waveguide and a thin InGaAs absorbing layer situated directly above the optical waveguide. Metal-semiconductor-metal (MSM) photodetectors are formed on the top surface of the InGaAs layer for collection of the photo-induced carriers. The optical ridge waveguide is designed for lateral incidence of the light to enhance the MSM photodetector responsivity. Initial measurements on the optical waveguide and photodetector are presented.

  1. The long noncoding RNAs PVT1 and uc002mbe.2 in sera provide a new supplementary method for hepatocellular carcinoma diagnosis.

    PubMed

    Yu, Jinyu; Han, Junqing; Zhang, Jian; Li, Guanzhen; Liu, Hui; Cui, Xianping; Xu, Yantian; Li, Tao; Liu, Juan; Wang, Chuanxi

    2016-08-01

    Hepatocellular carcinoma (HCC) is the most common primary malignancy of the liver in adults worldwide. Several studies have demonstrated that long noncoding RNAs (lncRNAs) are involved in the development of various types of cancer, including HCC. These findings prompted us to examine the detectability of lncRNAs in blood samples from patients with HCC. In this study, we explored the expression levels of 31 cancer-related lncRNAs in sera from 71 HCC patients and 64 healthy individuals by reverse transcription and quantitative polymerase chain reaction (RT-qPCR). We found that 25 lncRNAs could be detected in the serum and that 7 had significantly different expression levels. A 2-lncRNA signature (PVT1 and uc002mbe.2) identified by stepwise regression showed potential as a diagnostic marker for HCC. The area under the receiver operating characteristic (ROC) curve was 0.764 (95% CI: 0.684-0.833). The sensitivity and specificity values of this serum 2-lncRNA signature for distinguishing HCC patients from the healthy group were 60.56% and 90.62%, respectively. The diagnostic ability of the combination of the serum 2-lncRNA signature with alpha-fetoprotein (AFP) was much greater than that of AFP alone. The expression levels of the 2 lncRNAs were associated with clinical parameters including tumor size, Barcelona Clinic Liver Cancer (BCLC) stage, and serum bilirubin. PMID:27495068

  2. The MBE growth and optical quality of BaTiO{sub 3} and SrTiO{sub 3} thin films on MgO

    SciTech Connect

    McKee, R.A.; Specht, E.D.; Alexander, K.B.; Walker, F.J.

    1994-05-01

    High quality epitaxial BaTiO{sub 3} and SrTiO{sub 3} have been grown on MgO; stabilized at a one unit cell height; and grown to film thicknesses of 0.5--0.7 {mu}m. These relatively thick films remain adherent when thermally cycled between growth temperatures and room temperature, are crack free with high optical quality, and have both in-plane and out-of-plane X-ray rocking curves of 0.3--0.5{degree}. These films have been grown using molecular beam epitaxy (MBE) methods starting with the TiO{sub 2} layer of the perovskite structure. The TiO{sub 2}-layer/MgO interface uniquely satisfies electrostatic requirements for perovskite heteroepitaxy and provides the template structure that leads to the high quality films that are obtained. Wavelength dependence of optical loss has been characterized between 475 nm and 705 nm with loss coefficients < l dB/cm being obtained at the He-Ne wavelength.

  3. Structural and Magnetotransport Studies of MBE-grown Pn(Sn)Te films and PbTe:Bi/CdTe Quantum Wells

    NASA Astrophysics Data System (ADS)

    Li, Xiang; Liu, Xinyu; Furdyna, Jacek; Dobrowolska, Malgorzata; Wojtowicz, Tomasz

    2014-03-01

    Recent studies confirmed the existence of topological crystalline insulators (TCIs), in which crystalline symmetry replaces the role of time-reversal symmetry in ensuring topological protection. In the narrow-gap semiconductor TCIs, chemical potential can be tuned by modifications of crystal growth and/or annealing to yield n-type or p-type conductivity, which makes them especially well-suited for magnetotransport measurements. In this work, we have grown a series of Pb1-xSnxTe films and PbTe:Bi/CdTe QWs on CdTe/GaAs(100) substrates using MBE. Structural studies of these thin films were carried out using XRD and SEM techniques. XRD results shows satisfactory crystal quality of Pb(Sn)Te films grown on CdTe. SEM studies show the presence of inclusions in the films, indicating that the crystal quality still requires improvement. Magnetostransport studies of PbTe:Bi/CdTe QWs suggests that Bi acts as a donor in PbTe, and the electron mobility in the 2D electron gas in the QW depends on the growth conditions, such as substrate temperature. The study of Pb1-xSnxTe QWs is currently underway, and will also be discussed in this talk.

  4. The long noncoding RNAs PVT1 and uc002mbe.2 in sera provide a new supplementary method for hepatocellular carcinoma diagnosis

    PubMed Central

    Yu, Jinyu; Han, Junqing; Zhang, Jian; Li, Guanzhen; Liu, Hui; Cui, Xianping; Xu, Yantian; Li, Tao; Liu, Juan; Wang, Chuanxi

    2016-01-01

    Abstract Hepatocellular carcinoma (HCC) is the most common primary malignancy of the liver in adults worldwide. Several studies have demonstrated that long noncoding RNAs (lncRNAs) are involved in the development of various types of cancer, including HCC. These findings prompted us to examine the detectability of lncRNAs in blood samples from patients with HCC. In this study, we explored the expression levels of 31 cancer-related lncRNAs in sera from 71 HCC patients and 64 healthy individuals by reverse transcription and quantitative polymerase chain reaction (RT-qPCR). We found that 25 lncRNAs could be detected in the serum and that 7 had significantly different expression levels. A 2-lncRNA signature (PVT1 and uc002mbe.2) identified by stepwise regression showed potential as a diagnostic marker for HCC. The area under the receiver operating characteristic (ROC) curve was 0.764 (95% CI: 0.684–0.833). The sensitivity and specificity values of this serum 2-lncRNA signature for distinguishing HCC patients from the healthy group were 60.56% and 90.62%, respectively. The diagnostic ability of the combination of the serum 2-lncRNA signature with alpha-fetoprotein (AFP) was much greater than that of AFP alone. The expression levels of the 2 lncRNAs were associated with clinical parameters including tumor size, Barcelona Clinic Liver Cancer (BCLC) stage, and serum bilirubin. PMID:27495068

  5. ZnO film with ultra-low background electron concentration grown by plasma-assisted MBE using Mg film as the buffer layer

    SciTech Connect

    Chen, Mingming; Zhang, Quanlin; Su, Longxing; Su, Yuquan; Cao, Jiashi; Zhu, Yuan; Wu, Tianzhun; Gui, Xuchun; Yang, Chunlei; Xiang, Rong; Tang, Zikang

    2012-09-15

    Highlights: ► High quality ZnO film with ultra-low background electron concentration is grown by plasma-assisted molecular beam epitaxy using Mg film as a buffer layer. ► High resolution X-ray diffraction and photoluminescence (PL) spectroscopy indicate a high degree of crystallization. ► Hall measurement shows a carrier concentration as low as ∼10{sup 14} cm{sup −3}. ► The mechanism of the improved crystallinity is discussed in detail. -- Abstract: High quality ZnO epilayer with background electron concentration as low as 2.6 × 10{sup 14} cm{sup −3} was obtained by plasma-assisted MBE on c-sapphire using a thin Mg film as the buffer layer. High-resolution XRD measurement shows a sharp (0 0 2) peak with full width at half maximum (FWHM) of only 0.029°. Photoluminescence spectroscopy presents a weak defect-related near-edge emission. A metal–semiconductor–metal (MSM) typed photodetector based on the material demonstrates a response of ∼43 A/W under the bias of 1 V and an ON/OFF ratio of 10{sup 4}. This un-doped ZnO with ultra-low background electron concentration could be a promising starting material for p-type doping.

  6. MBE growth and transport properties of silicon δ-doped GaAs/AlAs quantum well structures for terahertz frequency detection

    NASA Astrophysics Data System (ADS)

    Lachab, M.; Khanna, S. P.; Harrison, P.; Linfield, E. H.; Čerškus, A.; Kundrotas, J.; Seliuta, D.; Valušis, G.

    2010-04-01

    We present the electrical characterization of n-type GaAs/AlAs multiple quantum well (MQW) structures designed for terahertz (THz) radiation sensing at cryogenic temperatures. The samples were grown by solid source molecular beam epitaxy (MBE) and were δ-doped with silicon atoms at each potential well center. Temperature dependent Hall effect data show that (i) the conduction in these planar doped structures is thermally activated below 180 K, (ii) the free carriers sheet densities are near the metal-insulator transition, and (iii) the low temperature mobility is controlled by ionized impurities scattering. The study of the magneto-transport properties at 1.3 K further indicates that only the fundamental electronic sub-band of the two-dimensional electronic gas is populated. The MQW samples were then processed into lateral mesa-shaped photodetectors to investigate their spectral response in the THz frequency range. The preliminary experimental results for the proposed detection scheme, which involves transitions in the confined shallow donor impurity states, are described.

  7. Structural and optical studies of GaN pn-junction with AlN buffer layer grown on Si (111) by RF plasma enhanced MBE

    NASA Astrophysics Data System (ADS)

    Yusoff, Mohd Zaki Mohd; Hassan, Zainuriah; Woei, Chin Che; Hassan, Haslan Abu; Abdullah, Mat Johar

    2012-06-01

    GaN pn-junction grown on silicon substrates have been the focus in a number of recent reports and further effort is still necessary to improve its crystalline quality for practical applications. GaN has the high n-type background carrier concentration resulting from native defects commonly thought to be nitrogen vacancies. In this work, we present the growth of pn-junction of GaN on Si (111) substrate using RF plasma-enhanced molecular beam epitaxy (MBE). Both of the layers show uniformity with an average thickness of 0.709 μm and 0.095 μm for GaN and AlN layers, respectively. The XRD spectra indicate that no sign of cubic phase of GaN are found, so it is confirmed that the sample possessed hexagonal structure. It was found that all the allowed Raman optical phonon modes of GaN, i.e. the E2 (low), E1 (high) and A1 (LO) are clearly visible.

  8. Structural and optical studies of GaN pn-junction with AlN buffer layer grown on Si (111) by RF plasma enhanced MBE

    SciTech Connect

    Yusoff, Mohd Zaki Mohd; Hassan, Zainuriah; Woei, Chin Che; Hassan, Haslan Abu; Abdullah, Mat Johar

    2012-06-29

    GaN pn-junction grown on silicon substrates have been the focus in a number of recent reports and further effort is still necessary to improve its crystalline quality for practical applications. GaN has the high n-type background carrier concentration resulting from native defects commonly thought to be nitrogen vacancies. In this work, we present the growth of pn-junction of GaN on Si (111) substrate using RF plasma-enhanced molecular beam epitaxy (MBE). Both of the layers show uniformity with an average thickness of 0.709 {mu}m and 0.095 {mu}m for GaN and AlN layers, respectively. The XRD spectra indicate that no sign of cubic phase of GaN are found, so it is confirmed that the sample possessed hexagonal structure. It was found that all the allowed Raman optical phonon modes of GaN, i.e. the E2 (low), E1 (high) and A1 (LO) are clearly visible.

  9. Controlling the compositional inhomogeneities in AlxGa1-xN/AlyGa1-yN MQWs grown by PA-MBE: Effect on luminescence properties

    NASA Astrophysics Data System (ADS)

    Pramanik, Pallabi; Sen, Sayantani; Singha, Chirantan; Roy, Abhra Shankar; Das, Alakananda; Sen, Susanta; Bhattacharyya, Anirban; Kumar, Deepak; Sridhara Rao, D. V.

    2016-04-01

    Al0.35Ga0.65N/Al0.55Ga0.45N MQWs were grown by PA-MBE using a range of group III/V flux ratios. TEM images indicate sharp interfaces and well/barrier widths of 1.5/2 nm. We observe that small variations of group III/V flux ratio cause dramatic variations in the room temperature photoluminescence (PL) spectra. In addition to band edge luminescence, multiple low energy PL peaks are observed for growths under excess group III conditions, which are absent for near-stoichiometric growth. Temperature dependent PL measurements indicate that at room temperature, emission occurs due to transitions at potential fluctuations generated by the presence of compositional inhomogeneity. These effects are dominant for growth under excess group III conditions due to the presence of a metallic layer on the growth surface during deposition. This can be eliminated by the use of an Indium surfactant during growth, which modifies the diffusion length of Ga and Al adatoms. Under these conditions, the optical properties of MQWs are relatively insensitive to variations in group III to V flux ratio and hence substrate temperature, thus making them suitable for industrial-scale fabrication of optoelectronic devices in the ultraviolet range.

  10. The impact of RF-plasma power in carrier relaxation dynamics of unintentional doped GaN epitaxial layers grown by MBE

    NASA Astrophysics Data System (ADS)

    Prakash, Nisha; Anand, Kritika; Barvat, Arun; Pal, Prabir; Singh, Dilip K.; Jewariya, Mukesh; Ragam, Srinivasa; Adhikari, Sonachand; Maurya, Kamlesh K.; Khanna, Suraj P.

    2016-04-01

    In this work, unintentionally doped GaN samples were prepared on GaN template by radio frequency (RF)-plasma MBE technique using two different RF-plasma powers. Photoluminescence (PL), steady state photoconductivity (PC) and ultrafast optical pump-probe spectroscopy measurements have been carried out to characterize the samples. The effect of RF-plasma power towards unintentional doping and giving rise to yellow luminescence (YL) is discussed. Our PC measurements show relatively faster decay for sample grown with higher RF-plasma power. In addition, the ultrafast optical pump-probe spectroscopy results show the presence of various defect levels with different relaxation times. A faster ultrafast relaxation time from the conduction band to the closest defect level and conduction band to the next defect level was observed for the sample grown with higher plasma power. A comparatively low defect density and faster carrier relaxation observed in higher RF-plasma power grown samples is caused by lower impurities and gallium vacancies. The results imply that RF-plasma power is very important parameter for the growth of epitaxial GaN films and undesirable impurities and gallium vacancies might get incorporated in the epitaxial GaN films.

  11. Carrier concentration dependence of donor activation energy in n-type GaN epilayers grown on Si (1 1 1) by plasma-assisted MBE

    SciTech Connect

    Kumar, Mahesh; Bhat, Thirumaleshwara N.; Roul, Basanta; Rajpalke, Mohana K.; Kalghatgi, A.T.; Krupanidhi, S.B.

    2012-06-15

    Highlights: ► The n-type GaN layers were grown by plasma-assisted molecular beam epitaxy. ► The optical characteristics of a donor level in Si-doped GaN were studied. ► Activation energy of a Si-related donor was estimated from temperature dependent PL measurements. ► PL peak positions, FWHM of PL and activation energies are found to be proportional to the cube root of carrier density. ► The involvement of donor levels is supported by the temperature-dependent electron concentration measurements. -- Abstract: The n-type GaN layers were grown by plasma-assisted MBE and either intentionally doped with Si or unintentionally doped. The optical characteristics of a donor level in Si-doped, GaN were studied in terms of photoluminescence (PL) spectroscopy as a function of electron concentration. Temperature dependent PL measurements allowed us to estimate the activation energy of a Si-related donor from temperature-induced decay of PL intensity. PL peak positions, full width at half maximum of PL and activation energies are found to be proportional to the cube root of carrier density. The involvement of donor levels is supported by the temperature-dependent electron concentration measurements.

  12. X-ray magnetic spectroscopy of MBE-grown Mn-doped Bi{sub 2}Se{sub 3} thin films

    SciTech Connect

    Collins-McIntyre, L. J.; Watson, M. D.; Zhang, S. L.; Coldea, A. I.; Hesjedal, T.; Baker, A. A.; Harrison, S. E.; Pushp, A.; Kellock, A. J.; Parkin, S. S. P.; Laan, G. van der

    2014-12-15

    We report the growth of Mn-doped Bi{sub 2}Se{sub 3} thin films by molecular beam epitaxy (MBE), investigated by x-ray diffraction (XRD), atomic force microscopy (AFM), SQUID magnetometry and x-ray magnetic circular dichroism (XMCD). Epitaxial films were deposited on c-plane sapphire substrates by co-evaporation. The films exhibit a spiral growth mechanism typical of this material class, as revealed by AFM. The XRD measurements demonstrate a good crystalline structure which is retained upon doping up to ∼7.5 atomic-% Mn, determined by Rutherford backscattering spectrometry (RBS), and show no evidence of the formation of parasitic phases. However an increasing interstitial incorporation of Mn is observed with increasing doping concentration. A magnetic moment of 5.1 μ{sub B}/Mn is obtained from bulk-sensitive SQUID measurements, and a much lower moment of 1.6 μ{sub B}/Mn from surface-sensitive XMCD. At ∼2.5 K, XMCD at the Mn L{sub 2,3} edge, reveals short-range magnetic order in the films and indicates ferromagnetic order below 1.5 K.

  13. Influence of High Nitrogen Flux on Crystal Quality of Plasma-Assisted MBE Grown GaN Layers Using Raman Spectroscopy: Part-II

    SciTech Connect

    Asghar, M.; Hussain, I.; Islah u din; Saleemi, F.

    2007-05-09

    We have investigated lattice properties of plasma assisted MBE grown hexagonal GaN layers at varying nitrogen and gallium fluxes using Raman spectroscopy. Room temperature Raman spectra of Ga-rich layers and stoichiometric GaN are similar showing excitation modes at 434 cm-1, 567 cm-1 and 729 cm-1 identified as residual laser line, E{sub 2}{sup H} and A1(LO) mode, respectively. Similarity of Ga-rich and stoichiometric GaN layers is interpreted as the indication of comparable crystal quality of both GaN layers. In contrast, Raman scattering associated with N-rich GaN samples mere exhibit a broad band of excitations in the range of 250-650cm-1 leaving out A1(LO) mode. This typical observation along with intensity distribution of the peaks, is correlated with rough surface, bad crystal quality and high concentration of defects. Based on atomic displacement scheme, the broad band is identified as Ga- vacancies.

  14. Comprehensive strain and band gap analysis of PA-MBE grown AlGaN/GaN heterostructures on sapphire with ultra thin buffer

    SciTech Connect

    Mahata, Mihir Kumar; Ghosh, Saptarsi; Jana, Sanjay Kumar; Bag, Ankush; Kumar, Rahul; Chakraborty, Apurba; Biswas, Dhrubes; Mukhopadhyay, Partha

    2014-11-15

    In this work, cluster tool (CT) Plasma Assisted Molecular Beam Epitaxy (PA-MBE) grown AlGaN/GaN heterostructure on c-plane (0 0 0 1) sapphire (Al{sub 2}O{sub 3}) were investigated by High Resolution X-ray Diffraction (HRXRD), Room Temperature Raman Spectroscopy (RTRS), and Room Temperature Photoluminescence (RTPL). The effects of strain and doping on GaN and AlGaN layers were investigated thoroughly. The out-of-plane (‘c’) and in-plane (‘a’) lattice parameters were measured from RTRS analysis and as well as reciprocal space mapping (RSM) from HRXRD scan of (002) and (105) plane. The in-plane (out-of plane) strain of the samples were found to be −2.5 × 10{sup −3}(1 × 10{sup −3}), and −1.7 × 10{sup −3}(2 × 10{sup −3}) in GaN layer and 5.1 × 10{sup −3} (−3.3 × 10{sup −3}), and 8.8 × 10{sup −3}(−1.3 × 10{sup −3}) in AlGaN layer, respectively. In addition, the band structures of AlGaN/GaN interface were estimated by both theoretical (based on elastic theory) and experimental observations of the RTPL spectrum.

  15. Si-doped AlGaAs/GaAs(6 3 1)A heterostructures grown by MBE as a function of the As-pressure

    NASA Astrophysics Data System (ADS)

    Méndez-García, Víctor-Hugo; Shimomura, S.; Gorbatchev, A. Yu.; Cruz-Hernández, E.; Vázquez-Cortés, D.

    2015-09-01

    The effects of doping with silicon (Si) AlGaAs layers grown by molecular beam epitaxy on GaAs (6 3 1)-oriented substrates as a function of the arsenic pressure (PAs) is presented and compared with layers grown on (1 0 0) oriented substrates. The surface texture of the AlGaAs (6 3 1) films is composed by nanogrooves, whose dimensions depend on PAs. On the contrary, the MBE growth on the (1 0 0) plane resulted on rough surfaces, without evidence of formation of terraces. Mobility and carrier density of AlGaAs:Si layers grown on substrates (6 3 1) were studied as a function of PAs. The doping type conversion from p-type to n-type as a function of the As pressure is corroborated for high index samples. All the films grown on (1 0 0) exhibited silicon n-type doping. These observations were related with the amphotericity of Si, where it acts as a donor impurity occupying Al or Ga-sites or as an acceptor when it takes an As-site, depending on the competition that the Si atoms encounters with As for any of these sites. The acceptor and donor lines close to the AlGaAs transition observed by photoluminescence spectroscopy (PL) were affected by the incorporation of Si. When increasing PAs the energy of the main PL peak is redshifted for n-type AlGaAs layers, but it is shifted back towards high energy once the conduction type conversion takes place. X-ray diffraction patterns revealed high crystalline quality for samples grown at the highest PAs.

  16. Anomalous elongation of c-axis of GaN on Al2O3 grown by MBE using NH3-cluster ions

    NASA Astrophysics Data System (ADS)

    Ichinohe, Yoshihiro; Imai, Kazuaki; Suzuki, Kazuhiko; Saito, Hiroshi

    2016-02-01

    GaN thin films were grown on Al2O3 (0001) by MBE using NH3-clusters either ionized with the energy of 4-7 eV/molecule (ionized Cluster Beam, i-CB) or un-ionized with the energy of about 0.1 eV/molecule (neutral Cluster Beam, n-CB) at growth temperatures ranging from 390 to 960 °C. The c-axis is extremely elongated but the a-axis is shrunken at the initial growth stage (up to the film thickness of about 10 nm) in GaN grown by the mixture of n- and i-CB under N-rich condition. The films thicker than 30 nm have the relaxed a- and c-axis lengths close to the unstrained values and obey the Poisson relation. GaN grown by i-CB under Ga-rich condition have the relaxed lattice constants obeying the Poisson relation for the film as thin as 6 nm. In GaN grown by the cluster beam (CB) which is not ionized intentionally, both a- and c-axis lengths are almost independent of the film thickness, having nearly the same values as those of the unstrained samples. These characteristics can be ascribed to the nature of interface between the nitrided Al2O3 substrate and epilayer. It is concluded that the films grown by i-CB bond firmly to underlay AlN than the films by n-CB and CB.

  17. GaInP/GaAs tandem solar cells with highly Te- and Mg-doped GaAs tunnel junctions grown by MBE

    NASA Astrophysics Data System (ADS)

    Zheng, Xin-He; Liu, San-Jie; Xia, Yu; Gan, Xing-Yuan; Wang, Hai-Xiao; Wang, Nai-Ming; Yang, Hui

    2015-10-01

    We report a GaInP/GaAs tandem solar cell with a novel GaAs tunnel junction (TJ) with using tellurium (Te) and magnesium (Mg) as n- and p-type dopants via dual-filament low temperature effusion cells grown by molecular beam epitaxy (MBE) at low temperature. The test Te/Mg-doped GaAs TJ shows a peak current density of 21 A/cm2. The tandem solar cell by the Te/Mg TJ shows a short-circuit current density of 12 mA/cm2, but a low open-circuit voltage range of 1.4 V˜1.71 V under AM1.5 illumination. The secondary ion mass spectroscopy (SIMS) analysis reveals that the Te doping is unexpectedly high and its doping profile extends to the Mg doping region, thus possibly resulting in a less abrupt junction with no tunneling carriers effectively. Furthermore, the tunneling interface shifts from the intended GaAs n++/p++ junction to the AlGaInP/GaAs junction with a higher bandgap AlGaInP tunneling layers, thereby reducing the tunneling peak. The Te concentration of ˜ 2.5 × 1020 in GaAs could cause a lattice strain of 10-3 in magnitude and thus a surface roughening, which also negatively influences the subsequent growth of the top subcell and the GaAs contacting layers. The doping features of Te and Mg are discussed to understand the photovoltaic response of the studied tandem cell. Project supported by the SINANO-SONY Joint Program (Grant No. Y1AAQ11001), the National Natural Science Foundation of China (Grant No. 61274134), the USCB Start-up Program (Grant No. 06105033), and the International Cooperation Projects of Suzhou City, China (Grant No. SH201215).

  18. Effects of MgO buffer annealing on optical and electrical quality of P-MBE grown ZnO films on c-sapphire

    NASA Astrophysics Data System (ADS)

    Setiawan, A.; Yao, T.

    2016-04-01

    Zinc oxide (ZnO) has been attracting much attention because of its potential applications in photonic and optoelectronic devices. In this present study, we investigated the effect of MgO buffer annealing on the optical and electrical quality of P-MBE grown ZnO films on c-sapphire with MgO buffer layer. The optical quality was observed by low-temperature PL (photoluminescence) measurement in the near band edge emission region measured at 10K and at 77K. The emission line located at 3.368eV dominates the spectrum in both samples (ZnO with and without MgO buffer annealing) at 10K and 77K. This emission can be divided into two peaks, 3.367eV and 3.363eV and assigned as I2 (ionized donor bound excitons emission) and I4 (Hydrogen donor related emission), respectively. The relative intensity of these donor bound exactions to free exaction emission of the sample without MgO buffer annealing is greater than that of the sample with MgO buffer annealing. Comparison of the PL spectra of ZnO with and without annealing revealed that the intensity of free exciton emission from the sample with MgO buffer annealing is twice of that from the sample without annealing. We also found that the intensity of deep-level broad emission is reduced by about 1/3 by MgO-buffer annealing. Hence, the decrease of deep level emission intensity and the increase of free exciton emission intensity by annealing of MgO buffer corresponds to the reduction of defects of the ZnO film. The PL properties also suggest that there are fewer nonradiative recombination centers in ZnO layers with MgO buffer annealing than those in ZnO layers grown without MgO buffer annealing. The electrical quality was measured by room temperature Hall measurements. We found that the samples have a background n-type carrier concentration. The ZnO samples with MgO buffer annealing has a carrier concentration of 1.17×1017 cm-3 and Hall mobility of 120 cm2/V.s, while the ZnO sample without MgO buffer annealing has a carrier

  19. Near-Infrared Absorption in Lattice-Matched AlInN/GaN and Strained AlGaN/GaN Heterostructures Grown by MBE on Low-Defect GaN Substrates

    NASA Astrophysics Data System (ADS)

    Edmunds, C.; Tang, L.; Li, D.; Cervantes, M.; Gardner, G.; Paskova, T.; Manfra, M. J.; Malis, O.

    2012-05-01

    We have investigated near-infrared absorption and photocurrent in lattice-matched AlInN/GaN and strained AlGaN/GaN heterostructures grown by molecular-beam epitaxy (MBE) on low-defect GaN substrates for infrared device applications. The AlGaN/GaN heterostructures were grown under Ga-rich conditions at 745°C. Material characterization via atomic force microscopy and high-resolution x-ray diffraction indicates that the AlGaN/GaN heterostructures have smooth and well-defined interfaces. A minimum full-width at half-maximum of 92 meV was obtained for the width of the intersubband absorption peak at 675 meV of a 13.7 Å GaN/27.5 Å Al0.47Ga0.53N superlattice. The variation of the intersubband absorption energy across a 1 cm × 1 cm wafer was ±1%. An AlGaN/GaN-based electromodulated absorption device and a quantum well infrared detector were also fabricated. Using electromodulated absorption spectroscopy, the full-width at half-maximum of the absorption peak was reduced by 33% compared with the direct absorption measurement. This demonstrates the suitability of the electromodulated absorption technique for determining the intrinsic width of intersubband transitions. The detector displayed a peak responsivity of 195 μA/W at 614 meV (2.02 μm) without bias. Optimal MBE growth conditions for lattice-matched AlInN on low-defect GaN substrates were also studied as a function of total metal flux and growth temperature. A maximum growth rate of 3.8 nm/min was achieved while maintaining a high level of material quality. Intersubband absorption in AlInN/GaN superlattices was observed at 430 meV with full-width at half-maximum of 142 meV. Theoretical calculations of the intersubband absorption energies were found to be in agreement with the experimental results for both AlGaN/GaN and AlInN/GaN heterostructures.

  20. Capping and decapping of MBE grown GaAs(001), Al 0.5Ga 0.5As(001), and AlAs(001) investigated with ASP, PES, LEED, and RHEED

    NASA Astrophysics Data System (ADS)

    Bernstein, R. W.; Borg, A.; Husby, H.; Fimland, B.-O.; Grepstad, J. K.

    Arsenic capping and regeneration of MBE-grown GaAs(001), Al 0.5Ga 0.5As(001), and AlAs(001) epilayer surfaces were examined with Auger sputter profiling (ASP), synchrotron radiation and X-ray photoelectron spectroscopy (PES), LEED, and RHEED. It is found that clean, ordered surfaces of different As/Ga(Al) compositions and different surface reconstructions can be prepared in a controlled manner after long-term storage in air, by thermal desorption of the As cap at appropriate annealing temperatures. A protective film of amorphous arsenic was deposited in situ with both As 2 and As 4 molecular beams onto cold substrates. The recorded Auger depth profiles unveil capping layer thicknesses from 0.3 to 3 μm, the thicker for depositions using the As 2 dimer source. The As 3+ surface oxide, formed immediately upon exposure of the passivated wafers to air, remains on the order of 10Åthick, even after storage in atmosphere for several months. Core level photoemission shows selective desorption of this oxide upon annealing in UHV at 250°C. Further heating at 350°C evaporates the protective arsenic cap, and clean, As-terminated Al xGa 1- xAs(001) surfaces with a regular arrayof chemisorbed excess As sbnd As dimers prevail. The recorded LEED and RHEED patterns show a c(4 × 4) surface reconstruction for GaAs(001) and Al 0.5Ga 0.5As(001), whereas this structural phase was observed with RHEED only for the highly reactive AlAs(001) surface. Subsequently annealing in UHV at 450°C causes desorption of the chemisorbed surface arsenic and a concurrent transition from c(4 × 4) to the (2 × 4)/c(2 × 8) surface of As stabilized MBE-grown Al xGa 1- xAs(001). With AlAs(001), surface Al oxidation was observed immediately after annealing at 450°C, in spite of carefully controlled UHV environments

  1. Defects and stresses in MBE-grown GaN and Al{sub 0.3}Ga{sub 0.7}N layers doped by silicon using silane

    SciTech Connect

    Ratnikov, V. V. Kyutt, R. N.; Smirnov, A. N.; Davydov, V. Yu.; Shcheglov, M. P.; Malin, T. V.; Zhuravlev, K. S.

    2013-12-15

    The electric and structural characteristics of silicon-doped GaN and Al{sub 0.3}Ga{sub 0.7}N layers grown by molecular beam epitaxy (MBE) using silane have been analyzed by the Hall effect, Raman spectroscopy, and high-resolution X-ray diffractometry. It is established that the electron concentration linearly increases up to n = 4 × 10{sup 20} cm{sup −3} with an increase in the silane flow rate for GaN:Si, whereas the corresponding dependence for Al{sub 0.3}Ga{sub 0.7}N:Si is sublinear and the maximum electron concentration is found to be n = 4 × 10{sup 19} cm{sup −3}. X-ray measurements of sample macrobending indicate a decrease in biaxial compressive stress with an increase in the electron concentration in both GaN:Si and Al{sub 0.3}Ga{sub 0.7}N:Si layers. The parameters of the dislocation structure, estimated from the measured broadenings of X-ray reflections, are analyzed.

  2. Adsorption-controlled growth of ferroelectric PbTiO{sub 3} and Bi{sub 4}Ti{sub 3}O{sub 12} films for nonvolatile memory applications by MBE

    SciTech Connect

    Theis, C.D.; Yeh, J.; Schlom, D.G.; Hawley, M.E.; Brown, G.W.

    1997-09-01

    Epitaxial PbTiO{sub 3} and Bi{sub 4}Ti{sub 3}O{sub 12} thin films have been grown on (100) SrTiO{sub 3} and (100) LaAlO{sub 3} substrates by reactive molecular beam epitaxy (MBE). Titanium is supplied to the film in the form of shuttered bursts each containing a one monolayer dose of titanium atoms for the growth of PbTiO{sub 3} and three monolayers for the growth of Bi{sub 4}Ti{sub 3}O{sub 12}. Lead, bismuth, and ozone are continuously supplied to the surface of the depositing film. Growth of phase pure, c-axis oriented epitaxial films with bulk lattice constants is achieved using an overpressure of these volatile species. With the proper choice of substrate temperature (600--650 C) and ozone background pressure (P{sub O{sub 3}} = 2 {times} 10{sup {minus}5} Torr), the excess of the volatile metals and ozone desorb from the surface of the depositing film leaving a phase-pure stoichiometric crystal. The smooth PbTiO{sub 3} surface morphology revealed by atomic force microscopy (AFM) suggests that the PbTiO{sub 3} films grow in a layer-by-layer fashion. In contrast the Bi{sub 4}Ti{sub 3}O{sub 12} films contain islands which evolve either continuously or around screw dislocations via a spiral-type growth mechanism.

  3. Arsenic incorporation in molecular beam epitaxy (MBE) grown (AlGaIn)(AsSb) layers for 2.0-2.5 μm laser structures on GaSb substrates

    NASA Astrophysics Data System (ADS)

    Simanowski, S.; Walther, M.; Schmitz, J.; Kiefer, R.; Herres, N.; Fuchs, F.; Maier, M.; Mermelstein, C.; Wagner, J.; Weimann, G.

    1999-05-01

    The incorporation of As and In during MBE growth in (AlGaIn)/(AsSb) layers used for the fabrication of diode lasers in the 2.0-2.5 μm wavelength range has been investigated. The As content was found to depend linearly on the beam equivalent pressure for As mole fractions between y=0.05 and y=0.20. Broad area AlGaAsSb/GaInAsSb single-quantum well laser diodes with quasi-cw output at room temperature at an emission wavelength of 2.03 μm and a threshold current density of 515 A/cm 2 for 1370 μm long and 70 μm wide devices have been fabricated. In order to shift the emission wavelength of the laser structures to longer wavelengths, the growth of lattice matched AlGaAsSb/GaInAsSb laser core structures with different In and As mole fractions in the quantum wells has been investigated.

  4. [Involution of the mammary gland. Enzyme histochemistry, elektron microscopy and radioautography (author's transl)].

    PubMed

    Korfsmeier, K

    1976-01-01

    A study has been made of the progress of involution of the mouse and rat mammary gland using histologic, electron microscopic, histochemical and autoradiographic methods. Particular emphasis has been placed on the morphology, metabolic alterations and activities of histochemically identifiable enzymes, and on the pharmacologic effects of lactation inhibiting agents and cytostatic drugs on lactation and involution. In order to allow a systematic investigation, involution was initiated in rats and mice by ligation of individual gland ducts at various time intervals. Both lactating glands and glands in different phases of involution were thus available in a given animal. The most important observation was that involution, which altogether takes approximately 2 weeks to be complete, involves a three-phase process, each phase being clearly distinguishable by morphologic and histochemical criteria. The first phase comprises approximately 4 days during which production of milk may be reinitiated. The second phase starts on day 5 of involution and constitutes the period of involution per se characterized by appreciable parenchymal cell degradation. The third phase, which starts around day 10, is the period of reorganization to the resting mammary gland. Early in the first phase of involution, substantial alveolar enlargement due to engorgement with milk, together with epithelial flattening, are prominent features. By day 3, the glandular contents decrease again in volume, the number of glandular cells and the constituent cytoplasmic organelles remaining unchanged during this period, except for the diminished appearance of fat droplets. In addition to normal appearing vacuoles with only occasional or sparse protein granules, giant vacuoles containing, in part, several hundred casein granules are found. Their formation appears to be due to increased stacking of granules in distended vacuoles prior to dissociation from the Golgi apparatus. In addition, however, the enhanced reactions of alP (alkaline phosphatase) and ATPase, which are found in the apical plasmalemma, are suggestive of resorptive activities. Protein particles absorbed from the glandular lumen equally appear to have a capacity for fusing into large vacuoles. The large protein granule-containing vacuoles regularly exhibit intense beta-Glu activity. This enzyme would appear to contribute actively to the degradation of excess milk during the first phase of involution. Autoradiographic studies reveal that the synthesis and release of proteins into the secretion is maintained for 3 days. While 3H-tyrosine uptake by the alveolar cells continues unchanged, the incorporation of 3H-palmitic acid into glandular lipoids, and of 3H-fucose into glandular polysaccharides is virtually blocked completely. An immediate reaction of the lipoid metabolism is also indicated by the decrease in 3HBDH activity on the first day of involution... PMID:186847

  5. Volatile Organic Analyzer (VOA) in 2006: Repair, Revalidation, and Restart of Elektron Even

    NASA Technical Reports Server (NTRS)

    Limero, Thomas

    2007-01-01

    The Volatile Organic Analyzer (VOA) had been providing valuable data on trace contaminants in the atmosphere of the International Space Station (ISS) from January 2002 through May 2003. Component temperature errors, detected by the VOA s software, shut down the unit in May 2003, but in early 2005 on orbit diagnostics verified fuse failures had disabled both VOA channels. An in-flight maintenance (IFM) session in December 2005 returned the VOA to an operational mode by January 2006. This paper will present the on-orbit data from 2006 that were used to revalidate the VOA, and provide an overview of the VOA s contributions during the Elecktron contingency event that occurred on ISS in September 2006.

  6. 77 FR 64519 - Magnesium Elektron; Analysis of Agreement Containing Consent Orders To Aid Public Comment

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-10-22

    ...The consent agreement in this matter settles alleged violations of federal law prohibiting unfair or deceptive acts or practices or unfair methods of competition. The attached Analysis to Aid Public Comment describes both the allegations in the draft complaint and the terms of the consent order--embodied in the consent agreement--that would settle these...

  7. Superlattice structures grown by metalorganic MBE

    NASA Astrophysics Data System (ADS)

    Tokumitsu, E.; Katoh, T.; Sung, C. P.; Sandhu, A.; Kimura, R.; Konagai, M.; Takahashi, K.

    1986-08-01

    The metalorganic molecular beam epitaxial (MOMBE) growth of GaAs and (GaAl)As using triethylgallium (TEG) and triethylaluminum (TEA) has been studied. GaAs/GaAlAs multi quantum well (MQW) heterostructures were fabricated and it was found that the photoluminescence peak energy at room temperature agreed with calculated values. Furthermore, a new technique to grow a nipi superlattice structure was proposed and as a trial growth a n-GaAs/n +-GaAs multilayer was prepared by applying an alternating ionization voltage to hydrogen.

  8. The Cleaning of Indium Phosphide Substrates for Growth by MBE

    NASA Astrophysics Data System (ADS)

    Hofstra, Peter

    1995-11-01

    A novel technique of using an in-situ ECR generated H-plasma to produce high quality surfaces on InP substrates, for growth of n-and p-type InP layers by GSMBE, has been investigated. The initial substrate surface quality determines the quality of the subsequently grown layers and therefore, the cleaning procedure is of critical importance. The standard approach entails a thermal desorption of a passivating oxide; however, this technique leaves carbon on the surface and, because oxides may vary in composition depending on the growth conditions, a consistent temperature for desorption may not be obtained. The desorption process is also dependent on the atmosphere in which it is carried out; i.e. whether an overpressure of P_2 or As _2 is used. Thermal desorption of oxides from InP requires the substrate to reach temperatures higher than normal GSMBE growth temperatures which can lead to substrate decomposition and, for regrowth applications, can alter dopant profiles and layer composition in ternary and quaternary layer growths. As an alternative, H-plasmas in separate vacuum chambers have been used to remove oxides from InP but this typically produces highly defective substrates due to a loss of phosphorus from the substrate. In this work the combination of an in-situ H-plasma with a stabilizing atmosphere of P_2 is used for the removal of oxides at temperatures equal to growth temperature and below. The mechanism involved in the thermal desorption of an oxide is first clarified and this procedure is compared with oxide removal by H-plasma etch in a phosphorus atmosphere. The ECR source can produce various plasma modes which have been thoroughly characterized. The effect of the different plasma conditions on clean InP is determined. These modes have different properties which result in different oxide etch rates. Various modes are compared and the mechanism of oxide removal is documented. As an alternative to oxide growth S-passivation has recently received attention as a surface passivation technique. Application of this surface, with and without H-plasma cleaning, has been investigated. The above treatments and other wet chemical surface treatments are compared to determine the optimal surface cleaning technique. The results indicate that thermal desorptions are driven by reaction with phosphorus from the substrate and therefore require high temperatures to promote significant phosphorus evaporation from the substrate. A H-plasma etch of the oxide is driven by the presence of atomic M in the plasma and results in the formation of water. Oxide removal rates were determine at various temperatures from 250^circC-490^ circC. The plasma etch was found to remove carbon contamination from the surface whereas, thermal desorptions do not. Defect levels in the underlying InP are sensitive to the plasma properties but with careful choice of plasma conditions defect states can be minimized. An optimal surface cleaning procedure has been developed which involves a UV-ozone treatment and H-plasma cleaning, resulting in interfaces free of electrically active defects in n -type material and a defect concentration of 8times10 ^{11} cm^{ -2} in p-type material.

  9. High growth speed of gallium nitride using ENABLE-MBE

    NASA Astrophysics Data System (ADS)

    Williams, J. J.; Fischer, A. M.; Williamson, T. L.; Gangam, S.; Faleev, N. N.; Hoffbauer, M. A.; Honsberg, C. B.

    2015-09-01

    Films of gallium nitride were grown at varying growth speeds, while all other major variables were held constant. Films grown determine the material impact of the high flux capabilities of the unique nitrogen plasma source ENABLE. Growth rates ranged from 13 to near 60 nm/min. X-ray ω scans of GaN (0002) have FWHM in all samples less than 300 arc sec. Cathodoluminescence shows radiative recombination for all samples at the band edge. In general material quality overall is high with slight degradation as growth speeds increase to higher rates.

  10. MBE-grown metamorphic lasers for applications at telecom wavelengths

    NASA Astrophysics Data System (ADS)

    Ledentsov, N. N.; Shchukin, V. A.; Kettler, T.; Posilovic, K.; Bimberg, D.; Karachinsky, L. Ya.; Gladyshev, A. Yu.; Maximov, M. V.; Novikov, I. I.; Shernyakov, Yu. M.; Zhukov, A. E.; Ustinov, V. M.; Kovsh, A. R.

    2007-04-01

    We have studied growth phenomena and structural and optical properties of metamorphic (MM) quantum dots (QDs) and QD lasers emitting in the 1.4-1.5 μm range. InAs/InGaAs QDs were grown on top of (In,Ga)As buffer layers deposited on GaAs (1 0 0) substrates. The wavelength of the QDs could be adjusted in the 1400-1600 nm spectral range by changing the composition of the (In,Ga)As matrix layer and by the amount of InAs deposited to form QDs. An additional wavelength shift can be achieved by strained-layer (In,Ga,Al)As overgrowth of the QDs. It is found that high-performance degradation-robust operation of the devices can be achieved through minimization of the defect density in the matrix material and within the QD sheets. A defect-reduction technique involving steps of strain-sensitive overgrowth and selective evaporation of the material in the defect-related areas was applied, leading to both elimination of dislocated clusters and blocking of propagating defects. MM QD lasers exhibited emission wavelength in the 1.4-1.5 μm range with a differential quantum efficiency of about ˜50% and pulsed power up to 7 W, limited by catastrophic optical mirror damage. The narrow-stripe lasers operate in a single transverse mode withstanding continuous wave current densities above 20 kA cm -2 without irreversible degradation. A maximum single mode continuous-wave output power of 220 mW limited by thermal roll-over is obtained. No beam filamentation was observed up to the highest pumping levels. Single-mode devices with as-cleaved facets are tested for 60 °C (800 h) and 70 °C (200 h) junction temperature. No noticeable degradation has been observed at 50 mW cw single mode output power, clearly manifesting for the first time degradation-free laser diodes on foreign substrates. The technology opens a way for integration of various III-V materials with silicon or germanium substrates for the next generation of microprocessors, optical interconnects and cascaded solar cells.

  11. MBE Growth of Graded Structures for Polarized Electron Emitters

    SciTech Connect

    Moy, Aaron; Maruyama, T.; Zhou, F.; Brachmann, A.

    2009-08-04

    SVT Associates, in collaboration with SLAC, has investigated two novel photocathode design concepts in an effort to increase polarization and quantum efficiency. AlGaAsSb/GaAs superlattice photocathodes were fabricated to explore the effect of antimony on device operation. In the second approach, an internal electrical field was created within the superlattice active layer by varying the aluminum composition in AlGaAs/GaAs. A 25% increase in quantum efficiency as a result of the gradient was observed.

  12. MBE Growth of GaAs Whiskers on Si Nanowires

    SciTech Connect

    Maxwell Andrews, Aaron

    2010-01-04

    We present the growth of GaAs nanowhiskers by molecular beam epitaxy on Si (111) nanowires grown by low-pressure chemical vapor deposition. The whiskers grow in the wurtzite phase, along the [0001] direction, on the {l_brace}112{r_brace} facets of the Si nanowire, forming a star-like six-fold radial symmetry. The photoluminescence shows a 30 meV blue shift with respect to bulk GaAs, additionally a GaAs/AlAs core-shell heterostructure shows increased luminescence.

  13. Picosecond spectroscopy of hydrogenated MBE-GaAs

    NASA Astrophysics Data System (ADS)

    Capizzi, M.; Coluzza, C.; Frankl, P.; Frova, A.; Colocci, M.; Gurioli, M.; Vinattieri, A.; Sacks, R. N.

    1991-04-01

    Picosecond-resolved and steady-state photoluminescence at LHe temperature in low-energy ion-gun hydrogenated GaAs/GaAlAs heterostructures are reported. The exciton in the GaAs layer shows an increase in lifetime - up to a factor of 3 - for moderate hydrogenation, followed by a sharp decrease below the value for the untreated sample, for higher H doses. Luminescence efficiency shows a consistent behavior. Incorporation of H generates a strong D-A band falling ˜64 meV below the gap energy. The behavior for heavy hydrogenation indicates the formation of a new type of deep defect, not ascribed to surface damage, because of the protective GaAlAs layer, plus the fact that the excitonic emission of the latter shows no variation.

  14. Progress in MBE grown type-II superlattice photodiodes

    NASA Technical Reports Server (NTRS)

    Hill, Cory J.; Li, Jian V.; Mumolo, Jason M.; Gunapala, Sarath D.

    2006-01-01

    We report on the status of GaSb/InAs type-II superlattice diodes grown and fabricated at the Jet Propulsion Laboratory designed for infrared absorption in the 8-12(mu)m range. Recent devices have produced detectivities as high as 8x10 to the tenth power Jones with a differential resistance-area product greater than 6 Ohmcm(sup 2) at 80K with a long wavelength cutoff of approximately 12(mu)m. The measured quantum efficiency of these front-side illuminated devices is close to 30% in the 10-11(mu)m range without antireflection coatings.

  15. InP based QCL in MBE production machine

    NASA Astrophysics Data System (ADS)

    Garcia, Michel; Vermersch, Francois Julien; Marcadet, Xavier; Bansropun, Shailendra; Carras, Mathieu; Wilk, Arnaud; Chaix, Christine; Sirtori, Carlo

    2006-02-01

    Quantum Cascade Lasers (QCL), emitting between 5 and 9 μm, have been realised with a view to achieving QCLs fabrication on a production scale. The growth of the structures was carried out in a multi-wafer RIBER 49 system (13 x 2" platen), and the processing sequence involved an Inductively Coupled Plasma (ICP) step for homogeneity and reproducibility purposes. To validate the approach used, a first batch of lasers, emitting around 9μm, based on a design already published [1], has been realised. State of the art performance on these devices (J th = 4.2 kA cm -2, η = 304 mW A -1, P max = 690 mW) has been achieved. A second set of strained balanced structures, emitting around 5.4μm, has been demonstrated, working in pulsed operation at room temperature(J th = 3.9 kA cm -2, η = 362 mW A -1, P max = 420 mW).

  16. Program plan for the MBE-4 multiple beam experiment

    SciTech Connect

    Avery, R.T.

    1985-02-01

    The technical description treats the arrangement of the Injector System (made up of an existing High Voltage Marx Generator, a new Four-beam Source array and a Beam Conditioning Unit for matching and steering) and the Accelerator Apparatus which contains the 24 shaped-pulsed accelerating units. Flexibility in diagnostic capability and physics experiments has been maintained insofar as possible.

  17. MBE Growth of Graded Structures for Polarized Electron Emitters

    SciTech Connect

    Not Available

    2010-08-25

    SVT Associates, in collaboration with SLAC, have investigated two novel photocathode design concepts in an effort to increase polarization and quantum efficiency. AlGaAsSb/GaAs superlattice photocathodes were fabricated to explore the effect of antimony on device operation. In the second approach, an internal electrical field was created within the superlattice active layer by varying the aluminum composition in AlGaAs/GaAs. A 25% increase in quantum efficiency as a result of the gradient was observed.

  18. Native defects in MBE-grown CdTe

    SciTech Connect

    Olender, Karolina; Wosinski, Tadeusz; Makosa, Andrzej; Tkaczyk, Zbigniew; Kolkovsky, Valery; Karczewski, Grzegorz

    2013-12-04

    Deep-level traps in both n- and p-type CdTe layers, grown by molecular-beam epitaxy on GaAs substrates, have been investigated by means of deep-level transient spectroscopy (DLTS). Four of the traps revealed in the DLTS spectra, which displayed exponential kinetics for capture of charge carriers into the trap states, have been assigned to native point defects: Cd interstitial, Cd vacancy, Te antisite defect and a complex formed of the Te antisite and Cd vacancy. Three further traps, displaying logarithmic capture kinetics, have been ascribed to electron states of treading dislocations generated at the mismatched interface with the substrate and propagated through the CdTe layer.

  19. MBE growth of GaP on a Si substrate

    SciTech Connect

    Sobolev, M. S. Lazarenko, A. A.; Nikitina, E. V.; Pirogov, E. V.; Gudovskikh, A. S.; Egorov, A. Yu.

    2015-04-15

    It is shown that single-crystal GaP buffer layers can be formed on a Si substrate by molecular-beam epitaxy, with the “migration-enhanced epitaxy” procedure applied in the stage in which the nucleating layer is formed. When a GaP layer is produced on a p-type silicon substrate, a p-n junction is created in a natural way between the p-Si substrate and the surface n-Si layer produced by the diffusion of phosphorus into the substrate during the course of the epitaxial growth of GaP. This p-n junction can be used as the first junction of a silicon-based multijunction photovoltaic converter.

  20. Properties of MBE-grown NbO2 thin films

    NASA Astrophysics Data System (ADS)

    Demkov, Alex; O'Hara, Andy; Posadas, Agham

    2014-03-01

    Niobium dioxide or NbO2 a sister compound of the more celebrated VO2, belongs to the class of transition metal oxides that undergo a temperature-driven metal-to-insulator transition. Using density functional theory, we explore the electronic properties of both the high-temperature metallic rutile and the low-temperature insulating distorted rutile phases. We investigate the nature of the transition and predict a large carrier concentration change even at the high transition temperature of 1080 K. We also grew thin NbO2 films on LSAT(111) single crystal substrates using molecular beam epitaxy. The films show very good crystallinity with a single out-of-plane orientation by x-ray diffraction, and exhibit a smooth surface with the presence of three epitaxial domains as observed by reflection high energy electron diffraction. The NbO2 stoichiometry is confirmed by x-ray photoemission measurements of the Nb 3d core level as well as the valence band.

  1. MBE growth technology for high quality strained III-V layers

    NASA Technical Reports Server (NTRS)

    Grunthaner, Frank J. (Inventor); Liu, John K. (Inventor); Hancock, Bruce R. (Inventor)

    1992-01-01

    III-V films are grown on large automatically perfect terraces of III-V substrates which have a different lattice constant, with temperature and Group II and V arrival rates chosen to give a Group III element stable surface. The growth is pulsed to inhibit Group III metal accumulation to low temperature, and to permit the film to relax to equilibrium. The method of the invention 1) minimizes starting step density on sample surface; 2) deposits InAs and GaAs using an interrupted growth mode (0.25 to 2 mono-layers at a time); 3) maintains the instantaneous surface stoichiometry during growth (As-stable for GaAs, In-stable for InAs); and 4) uses time-resolved RHEED to achieve aspects (1)-14 (3).

  2. Simple self-gettering differential-pump for minimizing source oxidation in oxide-MBE environment

    SciTech Connect

    Kim, Yong-Seung; Bansal, Namrata; Oh, Seongshik

    2011-07-15

    Source oxidation of easily oxidizing elements such as Ca, Sr, Ba, and Ti in an oxidizing ambient leads to their flux instability and is one of the biggest problems in the multielemental oxide molecular beam epitaxy technique. Here, the authors report a new scheme that can completely eliminate the source oxidation problem: a self-gettering differential pump using the source itself as the pumping medium. The pump simply comprises a long collimator mounted in front of the source in extended port geometry. With this arrangement, the oxygen partial pressure near the source was easily maintained well below the source oxidation regime, resulting in a stabilized flux, comparable to that of an ultrahigh-vacuum environment. Moreover, this pump has a self-feedback mechanism that allows a stronger pumping effectiveness for more easily oxidizing elements, which is a desired property for eliminating the source oxidation problem.

  3. Formation of pyramid-like nanostructures in MBE grown Si films on Si(001)

    SciTech Connect

    Galiana, Natalia; Martin, Pedro-Pablo; Garzon, L.; Rodriguez-Cañas, E.; Munuera, Carmen; Esteban-Betegon, F.; Varela del Arco, Maria; Ocal, Carmen; Alonso, Maria; Ruiz, Ana

    2010-01-01

    The growth of Si homoepitaxial layers on Si(001) substrates by molecular beam epitaxy is analyzed for a set of growth conditions in which diverse nanometric scale features develop. Using Si substrates prepared by exposure to HF vapor and annealing in ultra high vacuum, a rich variety of surface morphologies is found for different deposited layer thicknesses and substrate temperatures in a reproducible way, showing a critical dependence on both. Arrays of 3D islands (truncated pyramids), percolated ridge networks and square pit (inverted pyramids) distributions are observed. We analyze the obtained arrangements and find remarkable similarities to other semiconductor though heteroepitaxial systems. The nano-scale entities (islands or pits) display certain self assembly and ordering, concerning size, shape and spacing. Film growth sequence follows the islands-coalescence-2D growth pathway, eventually leading to optimum flat morphologies for high enough thickness and temperature.

  4. MBE grown Ga2O3 and its power device applications

    NASA Astrophysics Data System (ADS)

    Sasaki, Kohei; Higashiwaki, Masataka; Kuramata, Akito; Masui, Takekazu; Yamakoshi, Shigenobu

    2013-09-01

    N-type gallium oxide (Ga2O3) homoepitaxial thick films were grown on β-Ga2O3 (010) substrates by molecular beam epitaxy. The epitaxial growth rate was increased by more than 10 times by changing from the (100) plane to the (010) plane. The carrier concentration of the epitaxial layers could be varied within the range of 1016-1019 cm-3 by changing the Sn doping concentration. Schottky barrier diodes (SBDs) and metal-semiconductor field-effect transistors (MESFETs) on β-Ga2O3 homoepitaxial layers were demonstrated for the first time. The SBDs exhibited good device characteristics such as an ideality factor of 1.13, and high breakdown voltage about 125 V. The MESFETs also exhibited excellent characteristics such as a perfect pinch-off of the drain current, off-state breakdown voltage over 250 V, high on/off drain current ratio of around 104, and small gate leakage current. These device characteristics clearly indicate the great potential of Ga2O3 as a high-power device material.

  5. Space-charge behavior of 'Thin-MOS' diodes with MBE-grown silicon films

    NASA Technical Reports Server (NTRS)

    Lieneweg, U.; Bean, J. C.

    1984-01-01

    Basic theoretical and experimental characteristics of a novel 'Thin-MOS' technology, which has promising aspects for integrated high-frequency devices up to several hundred gigahertz are presented. The operation of such devices depends on charge injection into undoped silicon layers of about 1000-A thickness, grown by molecular beam epitaxy on heavily doped substrates, and isolation by thermally grown oxides of about 100-A thickness. Capacitance-voltage characteristics measured at high and low frequencies agree well with theoretical ones derived from uni and ambipolar space-charge models. It is concluded that after oxidation the residual doping in the epilayer is less than approximately 10 to the 16th/cu cm and rises by 3 orders of magnitude at the substrate interface within less than 100 A and that interface states at the oxide interface can be kept low.

  6. Surface defect states in MBE-grown CdTe layers

    SciTech Connect

    Olender, Karolina; Wosinski, Tadeusz; Fronc, Krzysztof; Tkaczyk, Zbigniew; Chusnutdinow, Sergij; Karczewski, Grzegorz

    2014-02-21

    Semiconductor surface plays an important role in the technology of semiconductor devices. In the present work we report results of our deep-level transient spectroscopy (DLTS) investigations of surface defect states in nitrogen doped p-type CdTe layers grown by the molecular-beam epitaxy technique. We observed a deep-level trap associated with surface states, with the activation energy for hole emission of 0.33 eV. DLTS peak position in the spectra for this trap, and its ionization energy, strongly depend on the electric field. Our measurements allow to determine a mechanism responsible for the enhancement of hole emission rate from the traps as the phonon-assisted tunnel effect. Density of surface defect states significantly decreased as a result of passivation in ammonium sulfide. Capacitance-voltage measurements confirmed the results obtained by the DLTS technique.

  7. Surface defects induced by impurities in MBE-grown HgCdTe

    NASA Astrophysics Data System (ADS)

    Fu, Xiangliang; Wang, Weiqiang; Wei, Qingzhu; Wu, Jun; Chen, Lu; Wu, Yan; He, Li

    2008-03-01

    Surface defects of molecular beam epitaxially grown HgCdTe are the major concern in developing large format infrared focal plane arrays. Voids were usually observed on the HgCdTe surfaces as previously reported, they were originated either from the improper substrates preparation or from the growth condition. However, the defects formation with impurities has not been addressed. This paper presents our recent observation on defects induced by the impurities involved in the mercury beam fluxes. These defects can be craters or bumps, having a spatially clustering feature. To identify the origin of these kinds of defects, experiments were performed on HgCdTe as well as CdTe with mercury flux, and the defects were observed and analyzed by using SEM and EDAX. The result, for the first time, confirmed that impurities in the mercury beam were responsible to the formation of surface defects.

  8. MBE growth technology for high quality strained III-V layers

    NASA Technical Reports Server (NTRS)

    Grunthaner, Frank J. (Inventor); Liu, John K. (Inventor); Hancock, Bruce R. (Inventor)

    1990-01-01

    The III-V films are grown on large automatically perfect terraces of III-V substrates which have a different lattice constant, with temperature and Group III and V arrival rates chosen to give a Group III element stable surface. The growth is pulsed to inhibit Group III metal accumulation of low temperature, and to permit the film to relax to equilibrium. The method of the invention: (1) minimizes starting step density on sample surface; (2) deposits InAs and GaAs using an interrupted growth mode (0.25 to 2 monolayers at a time); (3) maintains the instantaneous surface stoichiometry during growth (As-stable for GaAs, In-stable for InAs); and (4) uses time-resolved RHEED to achieve aspects (1) through (3).

  9. Development of MBE II-VI Epilayers on GaAs(211)B

    NASA Astrophysics Data System (ADS)

    Jacobs, R. N.; Nozaki, C.; Almeida, L. A.; Jaime-Vasquez, M.; Lennon, C.; Markunas, J. K.; Benson, D.; Smith, P.; Zhao, W. F.; Smith, D. J.; Billman, C.; Arias, J.; Pellegrino, J.

    2012-10-01

    Large-area, low-cost substrates are envisioned for next-generation HgCdTe infrared focal-plane arrays (IRFPA). Si, GaAs, Ge, and InSb have been previously examined as potential candidates. Fabrication of IRFPAs based on these substrates is limited by fundamental materials properties that potentially lead to lower detector performance and operability. Lattice and thermal mismatch between the substrate and epilayer are just two of several material factors that must be considered. We have reviewed these factors in the context of more recent data, and determined it worthwhile to revisit the use of GaAs substrates for epitaxial growth of HgCdTe. Our study starts with an evaluation of the surface quality (epireadiness) of commercially available (211) B-oriented GaAs substrates. Molecular beam epitaxial growth of CdTe buffer layers and subsequent HgCdTe absorber layers are performed in separate vacuum-interconnected chambers. The importance of optimization of the CdTe buffer layer growth for high-quality HgCdTe is detailed through surface morphology and x-ray studies. x-Ray diffraction rocking-curve full-width at half-maximum values as low as 52 arcsec have been obtained. Long-wave infrared Hg1- x Cd x Te ( x = 0.23) has been grown on these buffer layers, producing cross-hatch-dominated surface morphologies, with dislocation densities as low as ˜3 × 106 cm-2. We have also obtained (for optimized layers), 80-K Hall-effect n-type carrier concentration and electron mobility of approximately ~1.5 × 1015 cm-3 and 1 × 105 cm2 V-1 s-1, respectively. Finally, we briefly compare GaAs and Si in light of our preliminary investigation.

  10. Defect reduction in MBE-grown AlN by multicycle rapid thermal annealing

    NASA Astrophysics Data System (ADS)

    Greenlee, Jordan D.; Gunning, Brendan; Feigelson, Boris N.; Anderson, Travis J.; Koehler, Andrew D.; Hobart, Karl D.; Kub, Francis J.; Doolittle, W. Alan

    2016-01-01

    Multicycle rapid thermal annealing (MRTA) is shown to reduce the defect density of molecular beam epitaxially grown AlN films. No damage to the AlN surface occurred after performing the MRTA process at 1520°C. However, the individual grain structure was altered, with the emergence of step edges. This change in grain structure and diffusion of AlN resulted in an improvement in the crystalline structure. The Raman E2 linewidth decreased, confirming an improvement in crystal quality. The optical band edge of the AlN maintained the expected value of 6.2 eV throughout MRTA annealing, and the band edge sharpened after MRTA annealing at increased temperatures, providing further evidence of crystalline improvement. X-ray diffraction shows a substantial improvement in the (002) and (102) rocking curve FWHM for both the 1400 and 1520°C MRTA annealing conditions compared to the as-grown films, indicating that the screw and edge type dislocation densities decreased. Overall, the MRTA post-growth annealing of AlN lowers defect density, and thus will be a key step to improving optoelectronic and power electronic devices. [Figure not available: see fulltext.

  11. Device Fabrication using Crystalline CdTe and CdTe Ternary Alloys Grown by MBE

    SciTech Connect

    Zaunbrecher, Katherine; Burst, James; Seyedmohammadi, Shahram; Malik, Roger; Li, Jian V.; Gessert, Timothy A.; Barnes, Teresa

    2015-06-14

    We fabricated epitaxial CdTe:In/CdTe:As homojunction and CdZnTe/CdTe and CdMgTe/CdTe heterojunction devices grown on bulk CdTe substrates in order to study the fundamental device physics of CdTe solar cells. Selection of emitter-layer alloys was based on passivation studies using double heterostructures as well as band alignment. Initial results show significant device integration challenges, including low dopant activation, high resistivity substrates and the development of low-resistance contacts. To date, the highest open-circuit voltage is 715 mV in a CdZnTe/CdTe heterojunction following anneal, while the highest fill factor of 52% was attained in an annealed CdTe homojunction. In general, all currentvoltage measurements show high series resistance, capacitancevoltages measurements show variable doping, and quantum efficiency measurements show low collection. Ongoing work includes overcoming the high resistance in these devices and addressing other possible device limitations such as non-optimum junction depth, interface recombination, and reduced bulk lifetime due to structural defects.

  12. In Memory of Dorothy Heathcote, MBE (29 August 1926 to 8 October 2011)

    ERIC Educational Resources Information Center

    Saxton, Juliana; Miller, Carole

    2012-01-01

    In this article, the authors aim to provide a multifaceted lens on to Dorothy Heathcote's enormous influence on the field of drama education. They choose to order the reminiscences historically, focusing on Heathcote's consistency of passion and purpose. The anecdotes, lesson descriptions, and reminiscences capture her voice, her energy, and her…

  13. Surface reconstructions and transport of epitaxial PtLuSb (001) thin films grown by MBE

    NASA Astrophysics Data System (ADS)

    Patel, Sahil J.; Logan, John A.; Harrington, Sean D.; Schultz, Brian D.; Palmstrøm, Chris J.

    2016-02-01

    This work presents the surface reconstructions and transport properties of the topological insulator PtLuSb grown on Al0.1In0.9Sb/GaAs (001). Two stable surface reconstructions, (1×3) and c(2×2), were observed on PtLuSb (001) surfaces. Antimony-dimerization was determined to be the nature of the (1×3) surface reconstruction as evidenced by chemical binding energy shifts in the antimony 4d core-level for surface bonding components. The two surface reconstructions were studied as a function of Sb4 overpressure and substrate temperature to create a reconstruction phase diagram. From this reconstruction phase diagram, a growth window from 320 °C to 380 °C using an antimony overpressure was identified. Within this window, the highest quality films were grown at a growth temperature of 380 °C. These films exhibited lower p-type carrier concentrations as well as relatively high hole mobilities.

  14. MBE Growth of AlN Nanowires on Si Substrates by Aluminizing Nucleation.

    PubMed

    E, Yanxiong; Hao, Zhibiao; Yu, Jiadong; Wu, Chao; Liu, Runze; Wang, Lai; Xiong, Bing; Wang, Jian; Han, Yanjun; Sun, Changzheng; Luo, Yi

    2015-12-01

    By introducing an aluminization process to achieve nucleation of nanowires (NWs), spontaneous growth of AlN NWs on Si substrates has been realized by plasma-assisted molecular beam epitaxy. The AlN NWs are grown from the nuclei formed by the aluminization process, and the NW density and diameter can be controlled by the aluminization parameters. The influence of growth conditions on the morphologies of AlN NWs is carefully investigated. Island-like films are found to grow between the NWs due to poor migration ability of Al adatoms. The films are proved to be Al-polar different from the N-polar AlN NWs, which can explain the absence of newly formed NWs. Increasing the V/III ratio can efficiently suppress the growth of Al-polar AlN films. PMID:26437653

  15. GaInAs-AlInAs heterostructures for optical devices grown by MBE

    NASA Technical Reports Server (NTRS)

    Welch, D. F.; Wicks, G. W.; Woodard, D. W.; Eastman, L. F.

    1983-01-01

    The band gap of Ga(0.47)In(0.53)As corresponds to an emission wavelength of about 1.65 microns. Lasers have been produced with Al(0.48)In(0.52)As as cladding layers operating at room temperature. The peak emission of Ga(0.47)In(0.53)As can be continuously varied from 1.65 to 1.2 microns by the use of the multiquantum well structures. This range of wavelengths covers the minimum loss and dispersion in optical fibers and will be applicable to integrated optics. Double heterostructure broad area lasers have been fabricated using AlInAs as cladding layers to the GaInAs active layer. Room temperature threshold current densities of 4.3 kA/sq cm have been obtained for lasers with a 4500 A active region. The first data on GaInAs/AlInAs quantum well emitters will be presented. Photoluminescence of 4 K from quantum well layers of 100, 150, and 180 A with 150 A AlInAs barrier layers produced emission at 1.27, 1.35, and 1.41 microns, respectively. Ga(0.47)In(0.52)As quantum well LEDs have also been produced which emit at 1.34 microns.

  16. Determination of composition and energy gaps of GaInNAsSb layers grown by MBE

    NASA Astrophysics Data System (ADS)

    Aho, A.; Korpijärvi, V.-M.; Isoaho, R.; Malinen, P.; Tukiainen, A.; Honkanen, M.; Guina, M.

    2016-03-01

    We present a method to accurately determine the composition of GaInNAsSb heterostructures and a modified band anti-crossing model to calculate the corresponding bandgaps. The composition determination method is based on combining x-ray diffractometry and energy dispersive x-ray spectroscopy measurements. The modified band anti-crossing model was derived from the model known for GaInNAs and using band-gap composition relations for GaInAs, GaInSb, InAsSb and GaAsSb. The model parameters were defined by fitting with experimental bandgap data retrieved from photoluminescence. For validation and data fitting we used experimental samples with N composition in the range of 0-0.06, In composition from 0 to 0.17, and Sb composition in the range of 0-0.08. All samples were thermally annealed to minimize the band gap shift caused by the short range ordering effects in GaInNAsSb crystal. The modified model yields an excellent fit to the experimental band gap data with an accuracy of ~20 meV, and is a practical tool for designing, fabricating and analyzing optoelectronics devices.

  17. Optically addressed spatial light modulators by MBE-grown nipi MQW structures

    NASA Technical Reports Server (NTRS)

    Maserjian, Joseph; Andersson, P. O.; Hancock, B. R.; Iannelli, J. M.; Eng, S. T.; Grunthaner, F. J.

    1989-01-01

    Promising approaches for achieving optically addressed spatial light modulators (O-SLMs) are investigated based on combining nipi and multiple quantum well structures. Theoretical aspects of photooptic effects achievable in such structures are treated. Test structures are grown by molecular beam epitaxy using two material systems. (In,Ga)As/GaAs and (Al,Ga)As/GaAs. Experiments show large optically controlled modulation of the absorption coefficient in the quantum well layers, a log power dependence on the control signal, millisecond and shorter time response, and generally predictable behavior. The results are encouraging for several different O-SLM device structures proposed.

  18. Passivation of MBE grown InGaSb/InAs superlattice photodiodes

    NASA Technical Reports Server (NTRS)

    Hill, Cory J.; Keo, Sam S.; Mumolo, Jason M.; Gunapala, Sarath D.

    2005-01-01

    We have performed wet chemical passivation tests on InGaSb/InAs superlattice photodiode structures grown molecular beam epitaxy. The details of the devices growth and characterization as well as the results of chemical passivation involving RuCl3 and H2SO4 with SiO2 dielectric depositions are presented.

  19. MBE Growth of AlN Nanowires on Si Substrates by Aluminizing Nucleation

    NASA Astrophysics Data System (ADS)

    E, Yanxiong; Hao, Zhibiao; Yu, Jiadong; Wu, Chao; Liu, Runze; Wang, Lai; Xiong, Bing; Wang, Jian; Han, Yanjun; Sun, Changzheng; Luo, Yi

    2015-10-01

    By introducing an aluminization process to achieve nucleation of nanowires (NWs), spontaneous growth of AlN NWs on Si substrates has been realized by plasma-assisted molecular beam epitaxy. The AlN NWs are grown from the nuclei formed by the aluminization process, and the NW density and diameter can be controlled by the aluminization parameters. The influence of growth conditions on the morphologies of AlN NWs is carefully investigated. Island-like films are found to grow between the NWs due to poor migration ability of Al adatoms. The films are proved to be Al-polar different from the N-polar AlN NWs, which can explain the absence of newly formed NWs. Increasing the V/III ratio can efficiently suppress the growth of Al-polar AlN films.

  20. MBE grown GaAsBi/GaAs multiple quantum well structures: Structural and optical characterization

    NASA Astrophysics Data System (ADS)

    Richards, Robert D.; Bastiman, Faebian; Roberts, John S.; Beanland, Richard; Walker, David; David, John P. R.

    2015-09-01

    A series of GaAsBi/GaAs multiple quantum well p-i-n diodes were grown by molecular beam epitaxy. Nomarski images showed evidence of sub-surface damage in each diode, with an increase in the cross-hatching associated with strain relaxation for the diodes containing more than 40 quantum wells. X-ray diffraction ω-2θ scans of the (004) reflections showed that multiple quantum well regions with clearly defined well periodicities were grown. The superlattice peaks of the diodes containing more than 40 wells were much broader than those of the other diodes. The photoluminescence spectra showed a redshift of 56 meV and an attenuation of nearly two orders of magnitude for the 54 and 63 well diodes. Calculations of the quantum confinement and strain induced band gap modifications suggest that the wells in all diodes are thinner than their intended widths and that both loss of quantum confinement and strain probably contributed to the observed redshift and attenuation in the 54 and 63 well diodes. Comparison of this data with that gathered for InGaAs/GaAs multiple quantum wells, suggests that the onset of relaxation occurs at a similar average strain-thickness product for both systems. Given the rapid band gap reduction of GaAsBi with Bi incorporation, this data suggests that GaAsBi is a promising photovoltaic material candidate.

  1. MBE growth and interfaces characterizations of strained HgTe/CdTe topological insulators

    NASA Astrophysics Data System (ADS)

    Thomas, C.; Baudry, X.; Barnes, J. P.; Veillerot, M.; Jouneau, P. H.; Pouget, S.; Crauste, O.; Meunier, T.; Lévy, L. P.; Ballet, P.

    2015-09-01

    Topological insulator materials like HgTe exhibit unique electronic properties at their interfaces and so peculiar attention has to be paid concerning the growth optimization. Molecular beam epitaxy of tensile-strained HgTe/CdTe is investigated as a function of the growth temperature. Crystal quality is checked by using high resolution X-rays diffraction. By combining several material characterization techniques such as scanning transmission electronic microscopy, time-of-flight secondary ion mass spectroscopy and X-rays reflectivity, we report sharp interface morphology with nanometer-scale Hg/Cd diffusion lengths.

  2. Optical properties of ZnxMg1-xSe/GaAs heterojunctions grown by MBE

    NASA Astrophysics Data System (ADS)

    Bala, Waclaw; Glowacki, Grzegorz; Gapinski, Adam

    1997-06-01

    This works focuses on the study of optical properties of ZnxMg1-xSe epilayers grown by molecular beam epitaxy on n-type (001) GaAs substrates. Luminescence, reflectivity and Raman spectroscopy are studied. Photoluminescence spectra of the samples are dominated by blue emission bands, which can be associated with radiative recombination of free excitons. The reflectivity spectra were used to investigate the refractive index value and the thickness of the layers. Moreover the temperature dependence of the band-gap energy of ZnxMg1-xSe epilayers was determined. Using Raman spectroscopy we can obtain information about two kinds of longitudinal optical phonon modes observed at room temperature, whose frequencies and intensities depend characteristically on Mg content.

  3. Features of SOI substrates heating in MBE growth process obtained by low-coherence tandem interferometry

    NASA Astrophysics Data System (ADS)

    Volkov, P. V.; Goryunov, A.. V.; Lobanov, D. N.; Luk'yanov, A. Yu.; Novikov, A. V.; Tertyshnik, A. D.; Shaleev, M. V.; Yurasov, D. V.

    2016-08-01

    Differences in heating of silicon and silicon-on-insulator (SOI) substrates in molecular beam epitaxy were revealed by low-coherence tandem interferometry. Using this technique the interference effects which impede the correct evaluation of SOI substrate temperature by infrared pyrometers can be eliminated and so the reliable temperature readout can be achieved. It was shown that at the same thermocouple and heater power settings the real temperature of SOI substrates is higher than of silicon ones and the difference may be as high as 40-50 °C at temperatures close to 600 °C. It is supposed that such effect is caused by the additional absorption of heater radiation by the buried oxide layer in the mid-infrared range. Independent proof of this effect was obtained by growing on both types of substrates a series of structures with self-assembled Ge nanoislands whose parameters are known to be very temperature sensitive. The proposed low-coherence interferometry technique provides precise real-time control of the growth temperature and so allows formation of SiGe nanostructures with desired parameters.

  4. MBE growth of mid-IR type-II interband laser diodes

    NASA Astrophysics Data System (ADS)

    Schmitz, J.; Mermelstein, C.; Kiefer, R.; Walther, M.; Wagner, J.

    2005-05-01

    We report on molecular beam epitaxial growth and characterization of InAs/GaInSb/InAs/AlGaAsSb type-II miniband-to-bound state W-lasers. Laser core structures were characterized using photoluminescence, high resolution X-ray diffraction and Raman spectroscopy to reveal the best growth conditions. The growth temperature for the laser core was varied in the range between 380 °C and 460 °C and found to be optimal at 420 °C. Optimized laser active regions were embedded between 600 nm AlGaAsSb separate confinement layers which in turn were sandwiched between 1.5 μm thick n- and p-doped Al 0.85Ga 0.15As 0.07Sb 0.93 cladding layers. The upper cladding was capped with a 100 nm p +-GaSb contact layer. The growth temperature of the upper separate confinement and cladding layer was varied between 470 °C and 530 °C to reveal the influence on laser performance. Laser emission is observed near 3.2 μm. Devices with uncoated facets, mounted substrate side down could be operated up to a temperature of 185 K in continuous-wave (cw) mode. Single ended output powers of 144 mW in cw mode and 330 mW in pulsed operation were obtained for a 5-period diode laser structure with HR/AR coated mirror facets at an operation temperature of 110 K.

  5. Investigation of the terahertz emission characteristics of MBE-grown GaAs-based nanostructures

    NASA Astrophysics Data System (ADS)

    Takatori, Satoru; Minh, Pham Hong; Estacio, Elmer; Cadatal-Raduban, Marilou; Nakazato, Tomoharu; Shimizu, Toshihiko; Bailon-Somintac, Michelle; Somintac, Armando; Defensor, Michael; Gabayno, Jacqueline; Awitan, Fritz Christian B.; Jaculbia, Rafael B.; Garcia, Alipio; Ponseca, Carlito, Jr.; Salvador, Arnel; Sarukura, Nobuhiko

    2010-05-01

    We report experimental work on the terahertz emission characteristics of InAs/GaAs quantum dot (QD) structures and GaAs/AlGaAs modulation-doped heterojunctions (MDH's), excited by femtosecond laser. Results showed that the terahertz emission from MDH's can provide information on the GaAs/AlGaAs interface quality while the QD structures have the potential for being intense terahertz emitters; rivaling the emission intensity of p-type bulk InAs.

  6. ZnMgS-based solar-blind UV photodetectors grown by MBE

    NASA Astrophysics Data System (ADS)

    Sou, I. K.; Wu, Marcus C. W.; Wong, K. S.; Wong, G. K. L.

    2001-07-01

    Molecular beam epitaxial growth of Zn 1- xMg xS alloy thin films on GaP (1 0 0) substrates is reported. In situ reflection high energy electron diffraction (RHEED) studies show that the alloys can be grown with stable zinc-blende structure up to x around 30%. For x>30%, a phase transition will occur at a critical thickness which is sensitively dependent on the composition x. Several Schottky barrier photodetectors using Zn 1- xMg xS layer, with thickness less than the critical thickness, as active layer were fabricated. High ultra-violet responsivity and excellent visible rejection are achieved. The response curve of the Zn 0.43Mg 0.57S device offers a long wavelength cut-off at 295 nm and closely matches the erythemal action spectrum that describes human skin sensitivity to UV radiation.

  7. Gas-source MBE growth of strain-relaxed Si1-xCx on Si(100) substrates

    NASA Astrophysics Data System (ADS)

    Arimoto, Keisuke; Sakai, Shoichiro; Furukawa, Hiroshi; Yamanaka, Junji; Nakagawa, Kiyokazu; Usami, Noritaka; Hoshi, Yusuke; Sawano, Kentarou; Shiraki, Yasuhiro

    2013-09-01

    The hole effective mass in a compressively strained Si formed on a (100) surface is expected to be low. The growth of a high quality strain-relaxed Si1-xCx increases the possibility of high performance electronic devices using compressively strained Si film. In this study, growth conditions and their influence on microstructural aspects of Si1-xCx grown by gas-source molecular beam epitaxy were studied. Disilane and trimethylsilane were used as source gases. It was found that the strain-relaxation process and defect formation were influenced not only by substrate temperature but also by flow rates of the source gases. Relationships between the morphological aspects and non-substitutional carbon concentration were studied.

  8. Ellipsometric Study of NbO2 Grown by MBE on LSAT from 77 to 800 K

    NASA Astrophysics Data System (ADS)

    Nunley, T. N.; Zollner, S.; Hadamek, T.; Posadas, A. B.; O'Hara, A.; Demkov, A. A.

    2015-03-01

    NbO2 is a transition metal oxide that has been of interest for several decades. Like other complex oxides it has a metal-insulator transition provoked by external stimuli such as temperature, pressure, and electric fields. Our study shows the dielectric function of NbO2 grown by molecular beam epitaxy, optical axis in-plane, on (LaAlO3)0.3 (Sr2AlTaO6)0.35 (LSAT) substrates. The ellipsometric angles were measured from 0.76 to 6.52 eV using a UV/VIS variable-angle spectroscopic ellipsometer and from 250 to 1200 cm-1 using an FTIR ellipsometer. By using regression analysis we modeled our optical spectra with one model over the entire range from the mid-infrared to the near UV. For the LSAT substrate, we used optical constants from a previous study. A sum of Tauc-Lorentz oscillators describes the dielectric function of the NbO2 film. We have measured the dielectric function of the sample from 77-800 K. This has allowed us to see that the absorption peaks sharpen/broaden with decreasing/increasing temperature. We have also plotted the direct and indirect band gaps as a function of temperature.

  9. MBE growth of Sb-based nBn photodetectors on large diameter GaAs substrates

    NASA Astrophysics Data System (ADS)

    Lubyshev, Dmitri; Fastenau, Joel M.; Qiu, Yueming; Liu, Amy W. K.; Koerperick, Edwin J.; Olesberg, Jonathon T.; Norton, Dennis; Faleev, Nikolai N.; Honsberg, Christiana B.

    2013-06-01

    The GaSb-based family of materials and heterostructures provides rich bandgap engineering possibilities for a variety of infrared (IR) applications. Mid-wave and long-wave IR photodetectors are progressing toward commercial manufacturing applications, but to succeed they must move from research laboratory settings to general semiconductor production and they require larger diameter substrates than the current standard 2-inch and 3-inch GaSb. Substrate vendors are beginning production of 4-inch GaSb, but another alternative is growth on 6-inch GaAs substrates with appropriate metamorphic buffer layers. We have grown generic MWIR nBn photodetectors on large diameter, 6-inch GaAs substrates by molecular beam epitaxy. Multiple metamorphic buffer architectures, including bulk GaSb nucleation, AlAsSb superlattices, and graded GaAsSb and InAlSb ternary alloys, were employed to bridge the 7.8% mismatch gap from the GaAs substrates to the GaSb-based epilayers at 6.1 Å lattice-constant and beyond. Reaching ~6.2 Å extends the nBn cutoff wavelength from 4.2 to <5 µm, thus broadening the application space. The metamorphic nBn epiwafers demonstrated unique surface morphologies and crystal properties, as revealed by AFM, high-resolution XRD, and cross-section TEM. GaSb nucleation resulted in island-like surface morphology while graded ternary buffers resulted in cross-hatched surface morphology, with low root-mean-square roughness values of ~10 Å obtained. XRD determined dislocation densities as low as 2 × 107 cm-2. Device mesas were fabricated and dark currents of 1 × 10-6 A/cm2 at 150K were measured. This work demonstrates a promising path to satisfy the increasing demand for even larger area focal plane array detectors in a commercial production environment.

  10. The dependence of Raman scattering on Mg concentration in Mg-doped GaN grown by MBE

    NASA Astrophysics Data System (ADS)

    Flynn, Chris; Lee, William

    2014-04-01

    Magnesium-doped GaN (GaN:Mg) films having Mg concentrations in the range 5 × 1018-5 × 1020 cm-3 were fabricated by molecular beam epitaxy. Raman spectroscopy was employed to study the effects of Mg incorporation on the positions of the E2 and A1(LO) lines identifiable in the Raman spectra. For Mg concentrations in excess of 2 × 1019 cm-3, increases in the Mg concentration shift both lines to higher wave numbers. The shifts of the Raman lines reveal a trend towards compressive stress induced by incorporation of Mg into the GaN films. The observed correlation between the Mg concentration and the Raman line positions establish Raman spectroscopy as a useful tool for optimizing growth of Mg-doped GaN.

  11. Exploration of the growth parameter space for MBE-grown GaN1-xSbx highly mismatched alloys

    NASA Astrophysics Data System (ADS)

    Sarney, W. L.; Svensson, S. P.; Novikov, S. V.; Yu, K. M.; Walukiewicz, W.; Ting, M.; Foxon, C. T.

    2015-09-01

    Highly mismatched GaN1-xSbx alloys were grown under N-rich conditions at low substrate temperatures (325-550 °C) at a growth rates of ~0.09 μm/hr on sapphire. The alloys ranged in Sb composition from 0% to 16%, with the bandgap shifting from 3.3 to 1.6 eV in accordance with the band anticrossing (BAC) model. We compare these results to growths from another chamber, having a different N source, and using a faster growth rate (~0.24 μm/hr), much lower substrate temperatures (as low as 80 °C), different III/V ratios and absolute fluxes. Despite the range of morphologies obtained, all alloys follow the predictions of the BAC model with the bandgap only depending on the Sb composition.

  12. Defect studies in MBE grown GaSb{sub 1−x}Bi{sub x} layers

    SciTech Connect

    Segercrantz, N.; Kujala, J.; Tuomisto, F.; Slotte, J.; Song, Y.; Wang, S.

    2014-02-21

    Positron annihilation spectroscopy in Doppler broadening mode is used to study epitaxial layers of GaSb{sub 1−x}Bi{sub x} on undoped GaSb. The samples were grown by Molecular Beam Epitaxy at different temperatures and with different Bi/Sb beam equivalent pressure ratios resulting in Bi concentrations of 0–0.7 %. The results show a relationship between the growth parameters and Doppler broadening parameters. Incorporating Bi into GaSb decreases the vacancy concentration in the epitaxial layers compared to the sample with no Bi in the epitaxial layer.

  13. Hilda Mary Woods MBE, DSc, LRAM, FSS (1892–1971): reflections on a Fellow of the Royal Statistical Society

    PubMed Central

    Farewell, Vern; Johnson, Tony; Gear, Rosemary

    2012-01-01

    We have previously described the content of a text by Woods and Russell, An Introduction to Medical Statistics, compared it with Principles of Medical Statistics by Hill and set both volumes against the background of vital statistics up until 1937. The two books mark a watershed in the history of medical statistics. Very little has been recorded about the life and career of the first author of the earlier textbook, who was a Fellow of the Royal Statistical Society for at least 25 years, an omission which we can now rectify with this paper. We describe her education, entry into medical statistics, relationship with Major Greenwood and her subsequent career and life in Ceylon, Kenya, Australia, England and South Africa. PMID:22973076

  14. 40 CFR 33.203 - How does an entity qualify as an MBE or WBE under EPA's 10% statute?

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... controlled by such individuals. (See also 13 CFR 124.109 for special rules applicable to Indian tribes and Alaska Native Corporations; 13 CFR 124.110 for special rules applicable to Native Hawaiian Organizations... regulations of section 8(a)(5) of the Small Business Act (15 U.S.C. 637(a)(5); 13 CFR 124.103; see also 13...

  15. Sn-enriched Ge/GeSn nanostructures grown by MBE on (001) GaAs and Si wafers

    SciTech Connect

    Sadofyev, Yu. G. Martovitsky, V. P.; Klekovkin, A. V.; Saraykin, V. V.; Vasil’evskii, I. S.

    2015-12-15

    Elastically stressed metastable GeSn layers with a tin molar fraction as large as 0.185 are grown on (001) Si and GaAs wafers covered with a germanium buffer layer. A set of wafers with a deviation angle in the range 0°–10° is used. It is established that the GeSn crystal undergoes monoclinic deformation with the angle β to 88° in addition to tetragonal deformation. Misorientation of the wafers surface results in increasing efficiency of the incorporation of tin adatoms into the GeSn crystal lattice. Phase separation in the solid solution upon postgrowth annealing of the structures begins long before the termination of plastic relaxation of elastic heteroepitaxial stresses. Tin released as a result of GeSn decomposition predominantly tends to be found on the surface of the sample. Manifestations of the brittle–plastic mechanism of the relaxation of stresses resulting in the occurrence of microcracks in the subsurface region of the structures under investigation are found.

  16. Growth and structure of MBE grown TiO2 anatase films with rutile nano-crystallites

    SciTech Connect

    Shao, Rui; Wang, Chong M.; McCready, David E.; Droubay, Timothy C.; Chambers, Scott A.

    2007-03-15

    We have grown TiO2 anatase films with rutile nanocrystalline inclusions using molecular beam epitaxy under different growth conditions. This model system is important for investigating the role of rutile/anatase interfaces in heterogeneous photocatalysis. To control the film structure, we grew a pure anatase (001) layer at a slow rate and then increased the growth rate to drive the nucleation of rutile particles. Structure analysis indicates that the rutile phase has four preferred orientations in the anatase film.

  17. Determination of the dielectric functions of MBE-grown Zn1-xMgxTe II-VI semiconductor alloys

    NASA Astrophysics Data System (ADS)

    Franz, A. J.; Peiris, F. C.; Liu, X.; Bindley, U.; Furdyna, J. K.

    2004-02-01

    We have explored the dielectric functions of ternary Zn1-xMgxTe thin films using a variable angle spectroscopic ellipsometer for samples between x = 0 and x = 0.52. We obtained values for the complex dielectric function for Zn1-xMgxTe in both the transparent and absorption regions by incorporating a threelayer model to simulate the experimental data. To this end, we also used the previously published relations of the dispersion of the indices of refraction (in the transparent region) of Zn1-xMgxTe measured using a combination of prism coupler and reflectivity. We have fitted the second derivatives of both the real and the imaginary parts of the dielectric function to obtain the critical point parameters corresponding to the higher order electronic transitions in the lattice.

  18. Atomic force microscopy studies of homoepitaxial GaN layers grown on GaN template by laser MBE

    NASA Astrophysics Data System (ADS)

    Choudhary, B. S.; Singh, A.; Tanwar, S.; Tyagi, P. K.; Kumar, M. Senthil; Kushvaha, S. S.

    2016-04-01

    We have grown homoepitaxial GaN films on metal organic chemical vapor deposition (MOCVD) grown 3.5 µm thick GaN on sapphire (0001) substrate (GaN template) using an ultra-high vacuum (UHV) laser assisted molecular beam epitaxy (LMBE) system. The GaN films were grown by laser ablating a polycrystalline solid GaN target in the presence of active r.f. nitrogen plasma. The influence of laser repetition rates (10-30 Hz) on the surface morphology of homoepitaxial GaN layers have been studied using atomic force microscopy. It was found that GaN layer grown at 10 Hz shows a smooth surface with uniform grain size compared to the rough surface with irregular shape grains obtained at 30 Hz. The variation of surface roughness of the homoepitaxial GaN layer with and without wet chemical etching has been also studied and it was observed that the roughness of the film decreased after wet etching due to the curved structure/rough surface.

  19. Low-temperature growth of InGaN films over the entire composition range by MBE

    NASA Astrophysics Data System (ADS)

    Fabien, Chloe A. M.; Gunning, Brendan P.; Alan Doolittle, W.; Fischer, Alec M.; Wei, Yong O.; Xie, Hongen; Ponce, Fernando A.

    2015-09-01

    The surface morphology, microstructural, and optical properties of indium gallium nitride (InGaN) films grown by plasma-assisted molecular beam epitaxy under low growth temperatures and slightly nitrogen-rich growth conditions are studied. The single-phase InGaN films exhibit improved defect density, an absence of stacking faults, efficient In incorporation, enhanced optical properties, but a grain-like morphology. With increasing In content, we observe an increase in the degree of relaxation and a complete misfit strain relaxation through the formation of a uniform array of misfit dislocations at the InGaN/GaN interface for InGaN films with indium contents higher than 55-60%.

  20. Formation and Temperature Effect of InN Nanodots by PA-MBE via Droplet Epitaxy Technique.

    PubMed

    Chen, Hugo Juin-Yu; Yang, Dian-Long; Huang, Tseh-Wet; Yu, Ing-Song

    2016-12-01

    In this report, self-organized indium nitride nanodots have been grown on Si (111) by droplet epitaxy method and their density can reach as high as 2.83 × 10(11) cm(-2) for the growth at low temperature of 250 °C. Based on the in situ reflection high-energy electron diffraction, the surface condition, indium droplets, and the formation of InN nanodots are identified during the epitaxy. The X-ray photoelectron spectroscopy and photoluminescence measurements have shown the formation of InN nanodots as well. The growth mechanism of InN nanodots could be described via the characterizations of indium droplets and InN nanodots using scanning electron microscopy, atomic force microscopy, and transmission electron microscopy. The density of the InN nanodots was less than that of the In droplets due to the surface diffusion and desorption of atoms during the nitridation and annealing process. The average size and density of InN nanodots can be controlled by the substrate temperatures during the growth. For the growth at lower temperature, we obtained the higher density and smaller average size of InN nanodots. To minimize the total surface energy, the coarsening and some preferred orientations of InN nanodots were observed for the growth at high temperature. PMID:27142879

  1. A review of MBE grown 0D, 1D and 2D quantum structures in a nanowire

    NASA Astrophysics Data System (ADS)

    de la Mata, Maria; Zhou, Xiang; Furtmayr, Florian; Teubert, Jörg; Gradecak, Silvija; Eickhoff, Martin; Fontcuberta i Morral, Anna; Arbiol, Jordi

    2013-05-01

    We review different strategies to achieve a three-dimensional energy bandgap modulation in a nanowire (NW) by the introduction of self-assembled 0D, 1D and 2D quantum structures, quantum dots (QDs), quantum wires (QWRs) and quantum wells (QWs). Starting with the well-known axial, radial (coaxial/prismatic) or polytypic quantum wells in GaN/AlN, GaAs/AlAs or wurtzite/zinc-blende systems, respectively, we move to more sophisticated structures by lowering their dimensionality. New recent approaches developed for the self-assembly of GaN quantum wires and InAs or AlGaAs quantum dots on single nanowire templates are reported and discussed. Aberration corrected scanning transmission electron microcopy is presented as a powerful tool to determine the structure and morphology at the atomic scale allowing for the creation of 3D atomic models that can help us to understand the enhanced optical properties of these advanced quantum structures.

  2. MBE growth and transport of the topologically tunable (Bi1-x In x)2Se3 system

    NASA Astrophysics Data System (ADS)

    Brahlek, Matthew; Bansal, Namrata; Koirala, Nikesh; Xu, Suyang; Hasan, Zahid; Oh, Seongshik

    2012-02-01

    A current challenge in the field of topological insulators (TI) is identifying a clear transport signal of the surface conduction. The structural similarity between Bi2Se3 and In2Se3 allowed us to combine the two to obtain (Bi1-x In x)2Se3; Bi2Se3 has inverted bands, and thus is a non-trivial insulator. In2Se3 has no inverted bands and is therefore a trivial band insulator with energy gap 1.3-1.9eV. The mixing ratio x can be thought of as a knob to switch the system from a trivial to a non-trivial state. I will briefly discuss our scheme for producing atomically smooth molecular beam epitaxial grown thin films. I will also discuss our work on transport in the TI-to-non TI regime, and the metal to insulator regime, and compare these results with angle resolved photo emission spectroscopy data.

  3. A Complexity Approach toward Mind-Brain-Education (MBE); Challenges and Opportunities in Educational Intervention and Research

    ERIC Educational Resources Information Center

    Steenbeek, Henderien W.; van Geert, Paul L. C.

    2015-01-01

    In the context of an educational or clinical intervention, we often ask questions such as "How does this intervention influence the task behavior of autistic children?" or "How does working memory influence inhibition of immediate responses?" What do we mean by the word "influence" here? In this article, we introduce…

  4. 40 CFR 33.202 - How does an entity qualify as an MBE or WBE under EPA's 8% statute?

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... CFR 124.105 and 13 CFR 124.106, respectively. (See also 13 CFR 124.109 for special rules applicable to Indian tribes and Alaska Native Corporations; 13 CFR 124.110 for special rules applicable to Native... the implementing regulations of section 8(a)(5) of the Small Business Act (15 U.S.C. 637(a)(5); 13...

  5. 40 CFR 33.202 - How does an entity qualify as an MBE or WBE under EPA's 8% statute?

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... CFR 124.105 and 13 CFR 124.106, respectively. (See also 13 CFR 124.109 for special rules applicable to Indian tribes and Alaska Native Corporations; 13 CFR 124.110 for special rules applicable to Native... the implementing regulations of section 8(a)(5) of the Small Business Act (15 U.S.C. 637(a)(5); 13...

  6. 40 CFR 33.202 - How does an entity qualify as an MBE or WBE under EPA's 8% statute?

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... CFR 124.105 and 13 CFR 124.106, respectively. (See also 13 CFR 124.109 for special rules applicable to Indian tribes and Alaska Native Corporations; 13 CFR 124.110 for special rules applicable to Native... the implementing regulations of section 8(a)(5) of the Small Business Act (15 U.S.C. 637(a)(5); 13...

  7. Adsorption-controlled growth of BiFeO3 by MBE and integration with wide band gap semiconductors.

    SciTech Connect

    Ramesh, Ramamoorthy; Uecker, Reinhard , Germany); Doolittle, W. Alan; Reiche, P. , Germany); Liu, Zi-Kui; Bernhagen, Margitta , Germany); Tian, Wei; Ihlefeld, Jon F.; Schlom, Darrell G.

    2008-08-01

    BiFeO3 thin films have been deposited on (101) DyScO3, (0001) AlGaN/GaN, and (0001) SiC single crystal substrates by reactive molecular-beam epitaxy in an adsorption-controlled growth regime. This is achieved by supplying a bismuth over-pressure and utilizing the differential vapor pressures between bismuth oxides and BiFeO3 to control stoichiometry. Four-circle x-ray diffraction reveals phase-pure, epitaxial films with rocking curve full width at half maximum values as narrow as 7.2 arc seconds. Epitaxial growth of (0001)-oriented BiFeO3 thin films on (0001) GaN, including AlGaN HEMT structures, and (0001) SiC has been realized utilizing intervening epitaxial (111) SrTiO3/(100) TiO2 buffer layers. The epitaxial BiFeO3 thin films have two in-plane orientations: [1120] BiFeO3 [1120] GaN (SiC) plus a twin variant related by a 180{sup o} in-plane rotation. This epitaxial integration of the ferroelectric with the highest known polarization, BiFeO3, with wide band gap semiconductors is an important step toward novel field-effect devices.

  8. Spectroscopic determination of the bandgap crossover composition in MBE-grown AlxGa1-xAs

    DOE PAGESBeta

    Fluegel, Brian; Alberi, Kirstin; Reno, John; Mascarenhas, Angelo

    2015-03-12

    The aluminum concentration dependence of the energies of the direct and indirect bandgaps arising from the Γ and X conduction bands are measured at 1.7 K in the semiconductor alloy AlxGa1-xAs. The composition at which the bands cross is determined from photoluminescence of molecular-beam epitaxy samples grown very close to crossover. The use of resonant laser excitation and the improved sample linewidth allows precise determination of the bound exciton transition energies. Moreover, photoluminescence excitation spectroscopy is used to measure the binding energies of the donor-bound excitons and the Γ free exciton binding energy.

  9. Microstructure of non-polar GaN on LiGaO2 grown by plasma-assisted MBE.

    PubMed

    Shih, Cheng-Hung; Huang, Teng-Hsing; Schuber, Ralf; Chen, Yen-Liang; Chang, Liuwen; Lo, Ikai; Chou, Mitch Mc; Schaadt, Daniel M

    2011-01-01

    We have investigated the structure of non-polar GaN, both on the M - and A-plane, grown on LiGaO2 by plasma-assisted molecular beam epitaxy. The epitaxial relationship and the microstructure of the GaN films are investigated by transmission electron microscopy (TEM). The already reported epi-taxial relationship and for M -plane GaN is confirmed. The main defects are threading dislocations and stacking faults in both samples. For the M -plane sample, the density of threading dislocations is around 1 × 1011 cm-2 and the stacking fault density amounts to approximately 2 × 105 cm-1. In the A-plane sample, a threading dislocation density in the same order was found, while the stacking fault density is much lower than in the M -plane sample. PMID:21711945

  10. Microstructure of non-polar GaN on LiGaO2 grown by plasma-assisted MBE

    PubMed Central

    2011-01-01

    We have investigated the structure of non-polar GaN, both on the M - and A-plane, grown on LiGaO2 by plasma-assisted molecular beam epitaxy. The epitaxial relationship and the microstructure of the GaN films are investigated by transmission electron microscopy (TEM). The already reported epi-taxial relationship and for M -plane GaN is confirmed. The main defects are threading dislocations and stacking faults in both samples. For the M -plane sample, the density of threading dislocations is around 1 × 1011 cm-2 and the stacking fault density amounts to approximately 2 × 105 cm-1. In the A-plane sample, a threading dislocation density in the same order was found, while the stacking fault density is much lower than in the M -plane sample. PMID:21711945

  11. Improving the emission efficiency of MBE-grown GaN/AlN QDs by strain control

    PubMed Central

    2011-01-01

    The quantum-confined stark effect induced by polarization has significant effects on the optical properties of nitride heterostructures. In order to improve the emission efficiency of GaN/AlN quantum dots [QDs], a novel epitaxial structure is proposed: a partially relaxed GaN layer followed by an AlN spacer layer is inserted before the growth of GaN QDs. GaN/AlN QD samples with the proposed structure are grown by molecular beam epitaxy. The results show that by choosing a proper AlN spacer thickness to control the strain in GaN QDs, the internal quantum efficiencies have been improved from 30.7% to 66.5% and from 5.8% to 13.5% for QDs emitting violet and green lights, respectively. PMID:22136595

  12. Formation and Temperature Effect of InN Nanodots by PA-MBE via Droplet Epitaxy Technique

    NASA Astrophysics Data System (ADS)

    Chen, Hugo Juin-Yu; Yang, Dian-Long; Huang, Tseh-Wet; Yu, Ing-Song

    2016-05-01

    In this report, self-organized indium nitride nanodots have been grown on Si (111) by droplet epitaxy method and their density can reach as high as 2.83 × 1011 cm-2 for the growth at low temperature of 250 °C. Based on the in situ reflection high-energy electron diffraction, the surface condition, indium droplets, and the formation of InN nanodots are identified during the epitaxy. The X-ray photoelectron spectroscopy and photoluminescence measurements have shown the formation of InN nanodots as well. The growth mechanism of InN nanodots could be described via the characterizations of indium droplets and InN nanodots using scanning electron microscopy, atomic force microscopy, and transmission electron microscopy. The density of the InN nanodots was less than that of the In droplets due to the surface diffusion and desorption of atoms during the nitridation and annealing process. The average size and density of InN nanodots can be controlled by the substrate temperatures during the growth. For the growth at lower temperature, we obtained the higher density and smaller average size of InN nanodots. To minimize the total surface energy, the coarsening and some preferred orientations of InN nanodots were observed for the growth at high temperature.

  13. Trust: A Master Teacher's Perspective on Why It Is Important: How to Build It and Its Implications for MBE Research

    ERIC Educational Resources Information Center

    D'Andrea, Katherine Clunis

    2013-01-01

    Teaching is an interaction. It is a relationship between my students and myself. For successful interactions to take place there needs to be trust. In order for my students to be successful I have to be successful as well. My students and I have to have a variety of interactions. These interactions build trust, which leads to bonding. I believe…

  14. ZnMgO-based UV photodiodes: a comparison of films grown by spray pyrolysis and MBE

    NASA Astrophysics Data System (ADS)

    Hierro, A.; Tabares, G.; Lopez-Ponce, M.; Ulloa, J. M.; Kurtz, A.; Muñoz, E.; Marín-Borrás, V.; Muñoz-Sanjose, V.; Chauveau, J. M.

    2016-02-01

    Detecting the UV part of the spectrum is fundamental for a wide range of applications where ZnMgO has the potential to play a central role. The shortest achievable wavelength is a function of the Mg content in the films, which in turn is dependent on the growth technique. Moreover, increasing Mg contents lead to an electrical compensation of the films, which directly affects the responsivity of the photodetectors. In addition, the metal-semiconductor interface and the presence of grain boundaries have a direct impact on the responsivity through different gain mechanisms. In this work, we review the development of ZnMgO UV Schottky photodiodes using molecular beam epitaxy and spray pyrolysis, and we analyze and compare the physical mechanisms underlying the photodetector behavior.

  15. Monte Carlo simulation of V/III flux ratio influence on GaAs island nucleation during MBE

    NASA Astrophysics Data System (ADS)

    Ageev, O. A.; Solodovnik, M. S.; Balakirev, S. V.; Mikhaylin, I. A.

    2016-02-01

    The kinetic Monte Carlo simulation of GaAs/GaAs(001) molecular beam epitaxial growth considering V/III flux ratio influence on nucleating island characteristics is presented. It is shown that the island density increases with the surface coverage increase and reaches saturation after deposition of ∼0.1 monolayer of GaAs. The increase of V/III flux ratio from 3 to 40 leads to the increase of the island density from 1.9-1012 to 2.6-1012 cm-2. At the same time the average size decreases from 4.4 to 4.1 nm. The island size distribution function narrows with V/III flux ratio increase. This is attributed to the shortage of gallium atoms in comparison with deposited arsenic molecules that prevents large island formation and leads to the dramatic growth of little island concentration. The simulation demonstrates good agreement with experimental results.

  16. 40 CFR 33.203 - How does an entity qualify as an MBE or WBE under EPA's 10% statute?

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... controlled by such individuals. (See also 13 CFR 124.109 for special rules applicable to Indian tribes and Alaska Native Corporations; 13 CFR 124.110 for special rules applicable to Native Hawaiian Organizations... regulations of section 8(a)(5) of the Small Business Act (15 U.S.C. 637(a)(5); 13 CFR 124.103; see also 13...

  17. 40 CFR 33.203 - How does an entity qualify as an MBE or WBE under EPA's 10% statute?

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... controlled by such individuals. (See also 13 CFR 124.109 for special rules applicable to Indian tribes and Alaska Native Corporations; 13 CFR 124.110 for special rules applicable to Native Hawaiian Organizations... regulations of section 8(a)(5) of the Small Business Act (15 U.S.C. 637(a)(5); 13 CFR 124.103; see also 13...

  18. 40 CFR 33.203 - How does an entity qualify as an MBE or WBE under EPA's 10% statute?

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... controlled by such individuals. (See also 13 CFR 124.109 for special rules applicable to Indian tribes and Alaska Native Corporations; 13 CFR 124.110 for special rules applicable to Native Hawaiian Organizations... regulations of section 8(a)(5) of the Small Business Act (15 U.S.C. 637(a)(5); 13 CFR 124.103; see also 13...

  19. High-quality InN films on GaN using graded InGaN buffers by MBE

    NASA Astrophysics Data System (ADS)

    Islam, SM; Protasenko, Vladimir; Rouvimov, Sergei; (Grace Xing, Huili; Jena, Debdeep

    2016-05-01

    The growth of high-quality thick InN films is challenging because of the lack of native substrates. In this work, we demonstrate the use of a linearly graded InGaN buffer layer for the growth of InN films on GaN substrates. A 500 nm InN film with <0.1 nm RMS roughness is obtained with a peak mobility of 1410 cm2/(V·s) at 300 K. A strong room temperature photoluminescence showing a bandgap of 0.65 eV with 79 meV linewidth is observed. A graded InGaN buffer is found to lead to extremely smooth and high-quality InN films.

  20. 40 CFR 33.203 - How does an entity qualify as an MBE or WBE under EPA's 10% statute?

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... controlled by such individuals. (See also 13 CFR 124.109 for special rules applicable to Indian tribes and Alaska Native Corporations; 13 CFR 124.110 for special rules applicable to Native Hawaiian Organizations... subjected to racial or ethnic prejudice or cultural bias because of his or her identity as a member of...

  1. 40 CFR 33.202 - How does an entity qualify as an MBE or WBE under EPA's 8% statute?

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... CFR 124.105 and 13 CFR 124.106, respectively. (See also 13 CFR 124.109 for special rules applicable to Indian tribes and Alaska Native Corporations; 13 CFR 124.110 for special rules applicable to Native... person who has been subjected to racial or ethnic prejudice or cultural bias because of his or...

  2. Epitaxial dysprosium phosphide grown by gas-source and solid-source MBE on gallium arsenide substrates

    NASA Astrophysics Data System (ADS)

    Sadwick, L. P.; Lee, P. P.; Patel, M.; Nikols, M.; Hwu, R. J.; Shield, J. E.; Streit, D. C.; Brehmer, D.; McCormick, K.; Allen, S. J.; Gedridge, R. W.

    1996-07-01

    We report the first known study of the growth of epitaxial dysprosium phosphide (DyP) grown on gallium arsenide (GaAs). DyP is lattice matched to GaAs, with the room-temperature mismatch being less than 0.01%. We have grown DyP on GaAs by gas-source and by solid-source molecular beam epitaxy using custom-designed group V thermal cracker cells and group III high temperature effusion cells. X-ray diffraction results show the DyP epilayer to be (001) single crystal on GaAs(001) substrate. Electrical and optical measurements performed to date are inconclusive as to whether DyP is a semi-metal or a semiconductor with a small band gap. The undoped films are n-type with measured electron concentrations on the order of 5 × 10 19-6 × 10 20cm -3 with mobilities of 1-10 cm 2/V · s. {DyP}/{GaAs} is stable in air with no apparent oxidation taking place, even after months of exposure to ambient untreated air. Material and surface science properties measured for {DyP}/{GaAs} include Hall measurements, 2ϑ and double-crystal X-ray diffraction spectra and photothermal deflection spectroscopy.

  3. Droplet-mediated formation of embedded GaAs nanowires in MBE GaAs1-x Bi x films

    NASA Astrophysics Data System (ADS)

    Wood, Adam W.; Collar, Kristen; Li, Jincheng; Brown, April S.; Babcock, Susan E.

    2016-03-01

    We have examined the morphology and composition of embedded nanowires that can be formed during molecular beam epitaxy of GaAs1-x Bi x using high angle annular dark field (‘Z-contrast’) imaging in an aberration-corrected scanning transmission electron microscope. Samples were grown in Ga-rich growth conditions on a stationary GaAs substrate. Ga-rich droplets are observed on the surface with lateral trails extending from the droplet in the [110] direction. Cross-sectional scanning transmission electron microscopy of the film reveals epitaxial nanowire structures of composition ˜GaAs embedded in the GaAs1-x Bi x epitaxial layers. These nanowires extend from a surface droplet to the substrate at a shallow angle of inclination (˜4°). They typically are 4 μm long and have a lens-shaped cross section with major and minor axes dimensions of 800 and 120 nm. The top surface of the nanowires exhibits a linear trace in longitudinal cross-section, across which the composition change from ˜GaAs to GaAs1-x Bi x appears abrupt. The bottom surfaces of the nanowires appear wavy and the composition change appears to be graded over ˜25 nm. The droplets have phase separated into Ga- and Bi-rich components. A qualitative model is proposed in which Bi is gettered into Ga droplets, leaving Bi depleted nanowires in the wakes of the droplets as they migrate in one direction across the surface during GaAs1-x Bi x film growth.

  4. Surface roughness estimation of MBE grown CdTe/GaAs(211)B by ex-situ spectroscopic ellipsometry

    NASA Astrophysics Data System (ADS)

    Karakaya, Merve; Bilgilisoy, Elif; Arı, Ozan; Selamet, Yusuf

    2016-07-01

    Spectroscopic ellipsometry (SE) ranging from 1.24 eV to 5.05 eV is used to obtain the film thickness and optical properties of high index (211) CdTe films. A three-layer optical model (oxide/CdTe/GaAs) was chosen for the ex-situ ellipsometric data analysis. Surface roughness cannot be determined by the optical model if oxide is included. We show that roughness can be accurately estimated, without any optical model, by utilizing the correlation between SE data (namely the imaginary part of the dielectric function, <ɛ2 > or phase angle, ψ) and atomic force microscopy (AFM) roughness. <ɛ2 > and ψ values at 3.31 eV, which corresponds to E1 critical transition energy of CdTe band structure, are chosen for the correlation since E1 gives higher resolution than the other critical transition energies. On the other hand, due to the anisotropic characteristic of (211) oriented CdTe surfaces, SE data (<ɛ2 > and ψ) shows varieties for different azimuthal angle measurements. For this reason, in order to estimate the surface roughness by considering these correlations, it is shown that SE measurements need to be taken at the same surface azimuthal angle. Estimating surface roughness in this manner is an accurate way to eliminate cumbersome surface roughness measurement by AFM.

  5. Thermoelectric properties of MBE-grown HgCdTe-based superlattices from 100K to 300K

    NASA Astrophysics Data System (ADS)

    Zhang, Kejia; Yadav, Abhishek; Shao, Lei; Bommena, Ramana; Zhao, Jun; Velicu, Silviu; Pipe, Kevin P.

    2016-07-01

    We report on the thermoelectric properties of long-period HgCdTe superlattices (MCT SLs) from cryogenic temperature to room temperature. We find that the thermal conductivity is lower than the alloy value especially at low temperatures, the electrical conductivity is similar to that of alloy films, and the Seebeck coefficient is comparable to other SLs. Calculations based on Rytov's elastic model show that the phonon group velocity is reduced due to folding by more than a factor of two relative to its value in bulk CdTe or HgTe. Thermal conductivity is found to be relatively constant over a wide range of temperatures.

  6. Formation of Metal-Semiconductor Interfaces on Mbe-Grown Gallium ARSENIDE(100): Surface Photovoltage, Chemistry and Band Bending

    NASA Astrophysics Data System (ADS)

    Mao, Duli

    1992-01-01

    The chemical, structural and electronic properties of the metal-GaAs interfaces formed on the polar (100) surface are studied using high resolution core level photoemission spectroscopy (PES) and low energy electron diffraction (LEED). The clean (4 x 2)-c(8 x 2) reconstructed GaAs(100) surface, prepared by molecular beam epitaxy and subsequent thermal decapping of an As protective layer, is characterized carefully. Ga 3d and As 3d core levels are analyzed using test square curve fitting. Two Ga surface components are resolved while only one surface component is necessary for As. The assignment of these surface components to different surface atomic arrangements is discussed. The surface Fermi level position with respect to the valence band maximum is also investigated as a function of decapping temperature. Metal (In, Ga, Au)/GaAs(100) interfaces, formed at both room (RT) and low temperature (LT), are studied. The morphology of these interfaces resembles that of metal/GaAs(110) interfaces formed at LT, in that the deposited metal atoms reside at the surface as isolated adatoms rather than as clusters at submonolayer coverage. Metal clustering is only important at coverages higher than a few monolayers and is more prominent at RT than at LT. The GaAs(100) band bending is studied as a function of metal coverage and deposition temperature. At submonolayer metal coverages, In and Ga both cause reduced band bending (~ 0.2eV) on n-type GaAs, a phenomenon similar to the Fermi level overshoot observed at LT-formed metal/p-GaAs(110) interfaces and indicative of formation of adatom-induced donor levels in the upper part of the band gap. With Au, In and Ga, the Fermi level is pinned at 0.4eV, 0.6eV and 0.68eV above the valence band maximum respectively, in good agreement with the results obtained at metal/GaAs(110) interfaces. This contradicts recent claims of near-Schottky limit for these interfaces. Evidence of correlation between pinning and overlayer metallization is found for all three interfaces, supporting the metal induced gap states (MIGS) model for Schottky barrier formation. The synchrotron radiation-induced surface photovoltage (SPV), which could invalidate the apparent band bending measured with PES, is studied as a function of metal coverage and temperature, using a Kelvin probe. A large (0.55eV) and quasi-permanent SPV is observed on lightly doped n -GaAs at LT. A non-negligible (0.2eV) SPV is also observed at room temperature. No SPV is detected on highly doped GaAs. The impact of this synchrotron radiation induced SPV on the photoemission study of metal-semiconductor interfaces is discussed.

  7. Study of InN nanorods growth mechanism using ultrathin Au layer by plasma-assisted MBE on Si(111)

    NASA Astrophysics Data System (ADS)

    Kumar, Mahesh; Rajpalke, Mohana K.; Roul, Basanta; Bhat, Thirumaleshwara N.; Krupanidhi, S. B.

    2014-01-01

    InN nanorods (NRs) were grown on Si(111) substrate by plasma-assisted molecular beam epitaxy. The growth of InN NRs has been demonstrated using an electron-beam evaporated (~2 nm) Au layer prior to the initiation of growth. The structure and morphology of as deposited Au film, annealed at 600 °C, and InN NRs were investigated using X-ray photoelectron spectroscopy and scanning electron microscopy. Chemical characterization was performed with energy dispersive X-ray analysis. Single-crystalline wurtzite structure of InN NRs is verified by transmission electron microscopy. The formation process of NRs is investigated and a qualitative mechanism is proposed.

  8. Laser MBE-grown yttrium iron garnet films on GaN: characterization of the crystal structure and magnetic properties

    NASA Astrophysics Data System (ADS)

    Kaveev, A. K.; Bursian, V. E.; Gastev, S. V.; Krichevtsov, B. B.; Suturin, S. M.; Volkov, M. P.; Sokolov, N. S.

    2016-07-01

    Yttrium iron garnet (YIG) films were grown on GaN substrates using the laser molecular beam epitaxy method. X-ray diffraction data showed polycrystalline YIG layers without additional structural modifications. The magnetic properties of the YIG films were studied at room temperature with the aid of a vibration sample magnetometer, the magneto-optical Kerr effect and ferromagnetic resonance methods. ‘Easy-plane’-type magnetic anisotropy was found in the films. The gyromagnetic ratio and 4 πMS value were calculated.

  9. MBE growth and characterization of (100) and (631)-oriented modulation doped AlGaAs/GaAs heterostructures

    NASA Astrophysics Data System (ADS)

    Mendez-Garcia, V. H.; González-Fernández, J. V.; Espinosa-Vega, L. I.; Díaz, T.; Romano, R.; Rosendo, E.; Gallardo, S.; Vázquez-Cortes, D.; Shimomura, S.

    2013-09-01

    In this work, the optical and electrical properties of simultaneously grown modulation-doped heterostructures (MDH) on (100)- and (631)-oriented GaAs substrates are investigated. Due to the amphoteric behavior of Si in AlGaAs doped films two dimensional electron (2DEG) and hole gas (2DHG) structures for the growth on (100) and (631) planes, respectively are obtained. Atomic force microscopy (AFM) revealed atomically flat surface for the (100)-MDH sample. On the contrary, (631)-MDH sustained uniform corrugation along [1¯13] after the growth of the GaAs films, which provoked anisotropic mobility of the carriers at 77 K as confirmed by the Hall effect in a double arm bar. By photoluminescence spectroscopy (PL) the band to band transition, carbon and Si-related lines were identified. The concentration of the ternary alloy and impurities were evaluated by secondary ion mass spectrometry.

  10. Austauschskräfte zwischen Elementarteilchen und Fermische Theorie des β-Zerfalls als Konsquenzen einer möglichen Feldtheorie der Materie [26

    NASA Astrophysics Data System (ADS)

    Inhalt: Elektron, Neutrino, Proton und Neutron werden als vier verschiedene Quantenzustände einer einzigen Elementpartikel angesehen. Quantensprünge zwischen diesen Zuständen erklären den β-Zerfall (gemäss der Theorie von Fermi) und geben zur HEISENBEBe-MAJOKANA'schen Neutron-Proton-Austauschkraft Anlass. Die Pestsetzung, dass negatives Elektron und positives Proton "Partikel"-Zustände (im Gegensatz zu "Antipartikel") sind, verbietet Zerstrahlungsprozesse der schweren Teilchen. Die umgekehrte Festsetzung (positives Elektron und positives Proton sind Partikel) führt zu Zerstrahlungsprozessen (siehe Zusammenfassung).

  11. Sb[subscript 2]Te[subscript 3] and Bi[subscript 2]Te[subscript 3] Thin Films Grown by Room-Temperature MBE

    SciTech Connect

    Aabdin, Z.; Peranio, N.; Winkler, M.; Bessas, D.; König, J.; Hermann, R.P.; Böttner, H.; Eibl, O.

    2012-10-23

    Sb{sub 2}Te3 and Bi{sub 2}Te3 thin films were grown on SiO{sub 2} and BaF{sub 2} substrates at room temperature using molecular beam epitaxy. Metallic layers with thicknesses of 0.2 nm were alternately deposited at room temperature, and the films were subsequently annealed at 250 C for 2 h. x-Ray diffraction and energy-filtered transmission electron microscopy (TEM) combined with high-accuracy energy-dispersive x-ray spectrometry revealed stoichiometric films, grain sizes of less than 500 nm, and a texture. High-quality in-plane thermoelectric properties were obtained for Sb{sub 2}Te3 films at room temperature, i.e., low charge carrier density (2.6 x 10{sup 19} cm{sup -3}, large thermopower (130 {micro}V K{sup -1}), large charge carrier mobility (402 cm{sup 2} V{sup -1} s{sup -1}), and resulting large power factor (29 {micro}W cm{sup -1} K{sup -2}). Bi{sub 2}Te3 films also showed low charge carrier density (2.7 x 10{sup 19} cm{sup -3}), moderate thermopower (-153 {micro}V K{sup -1}), but very low charge carrier mobility (80 cm{sup 2} V{sup -1} s{sup -1}), yielding low power factor (8 {micro}W cm{sup -1} K{sup -2}). The low mobilities were attributed to Bi-rich grain boundary phases identified by analytical energy-filtered TEM.

  12. Multistage nucleation of two-dimensional Si islands on Si(111)-7x7 during MBE growth: STM experiments and extended rate-equation model

    SciTech Connect

    Filimonov, Sergey; Cherepanov, Vasily; Voigtlaender, Bert; Hervieu, Yuri

    2007-07-15

    The submonolayer density of two-dimensional (2D) islands in Si/Si(111)-7x7 molecular beam epitaxy is measured using scanning tunneling microscopy. At a relatively low deposition temperature of 673 K, the density of 2D islands is a power function of the deposition flux N{sub 2D}{proportional_to}F{sup {chi}} with the exponent {chi}=0.24 being smaller than that predicted by the standard nucleation theory. The nonstandard scaling of the 2D island density is explained by the multistage character of the nucleation process on the Si(111)-7x7 surface which involves consecutive stages of formation of stable Si clusters, formation of pairs of clusters, and transformation of the cluster pairs to 2D islands. Using an extended rate-equation model, we analyze the temperature and growth rate dependencies of the density of single clusters, cluster pairs, and 2D islands and show that an activation barrier of {approx}1.26 eV delays the transformation of cluster pairs to 2D islands. The delayed transformation of cluster pairs to 2D islands is the reason for the nonstandard scaling of the 2D island density observed at low deposition temperatures.

  13. Growth mode and properties of Mn-Co-Ni-O NTC thermistor thin films deposited on MgO (100) substrate by laser MBE

    NASA Astrophysics Data System (ADS)

    Xie, Yahong; Kong, Wenwen; Ji, Guang; Gao, Bo; Yao, Jincheng; Chang, Aimin

    2014-12-01

    Mn1.56Co0.96Ni0.48O4-δ thin films were deposited on MgO (100) substrate using laser molecular beam epitaxy (LMBE) technique at the temperature range of 300-600°C under oxygen partial pressure of 5 × 10-3 Pa. The effect of growth temperature on microstructure and electrical properties as well as the growth mode were studied using XRD, RHEED, AFM and resistance-temperature measurements. The results showed that all prepared thin films underwent epitaxial growth along the single-(100) orientation direction of the MgO substrate from 3D-island mode to 2D layer-by-layer mode, and exhibited good crystallinity and NTC thermistor behavior. Their resistance at room temperature can be in the range of 10-50 MΩ together with a B-value of about 3300 K, which are desirable for a wide range of practical applications of the NTC thermistors.

  14. Increased bismuth concentration in MBE GaAs{sub 1−x}Bi{sub x} films by oscillating III/V flux ratio during growth

    SciTech Connect

    Wood, Adam W. Babcock, Susan E.; Li, Jincheng; Brown, April S.

    2015-05-15

    The authors have examined bismuth concentration profiles in GaAs{sub 1−x}Bi{sub x} films grown by molecular beam epitaxy using high angle annular dark field imaging (Z-contrast imaging) in an aberration-corrected scanning transmission electron microscope in conjunction with x-ray diffraction. Samples were grown with a gradient in each of the component fluxes, and therefore, the III/V ratio across the substrate. Rotating the sample during growth exposed the growth surface to an oscillating III/V flux ratio. Sinusoidal [Bi] profiles resulted in the growth direction, the wavelength and number of which were consistent with the growth rate and the rate of substrate rotation. However, the magnitude of [Bi] in the observed fluctuations was greater than the maximum [Bi] achieved using the same Bi flux and Ga/As flux ratios in steady-state conditions on a stationary substrate, suggesting that varying the III/V flux ratio during growth promotes the incorporation of Bi in GaAs{sub 1−x}Bi{sub x} films. A proposed qualitative model for how this enhancement might occur hypothesizes a critical role for alternating growth and shrinkage of Ga-Bi predroplet clusters on the surface as the growing material is rotated through Ga-rich and As-rich flux compositions.

  15. Selective MBE growth of nonalloyed ohmic contacts to 2D electron gas in high-electron-mobility transistors based on GaN/AlGaN heterojunctions

    NASA Astrophysics Data System (ADS)

    Maiboroda, I. O.; Andreev, A. A.; Perminov, P. A.; Fedorov, Yu. V.; Zanaveskin, M. L.

    2014-06-01

    Specific features of how nonalloyed ohmic contacts to the 2D conducting channel of high-electron-mobility transistors based on AlGaN/(AlN)/GaN heterostructures are fabricated via deposition of heavily doped n +-GaN through a SiO2 mask by ammonia molecular-beam epitaxy have been studied. The technique developed makes it possible to obtain specific resistances of contacts to the 2D gas as low as 0.11 Ω mm on various types of Ga-face nitride heterostructures, which are several times lower than the resistance of conventional alloyed ohmic contacts.

  16. Detailed structural analysis of epitaxial MBE-grown Fe/Cr superlattices by x-ray diffraction and transmission-electron spectroscopy

    SciTech Connect

    Gomez, M.E.; Santamaria, J.; Kim, S.; Schuller, Ivan K.; Krishnan, Kannan M.

    2005-03-15

    We have performed a detailed quantitative structural analysis of epitaxial [Fe(3 nm)/Cr(1.2 nm)]{sub 20} superlattices by low- and high-angle x-ray diffraction, and energy-filtered transmission electron microscopy on cross-section samples. The interface roughness was changed systematically by varying the substrate temperature (150-250 deg. C) maintaining all other growth parameters fixed. Direct imaging of the interfaces allows examining the roughness of the individual interfaces and its evolution with thickness. A statistical analysis of the local interface width for the individual layers supplies the roughness static and dynamic exponents. High-temperature samples (250 deg. C) show roughness decreasing with thickness as a result of surface-diffusion-dominated growth. Low-temperature samples (150 deg. C) show anomalous non-self-affine roughness characterized by a time-dependent local interface width.

  17. Electrical and optical properties of carbon-doped GaN grown by MBE on MOCVD GaN templates using a CCl4 dopant source

    SciTech Connect

    Armitage, Rob; Yang, Qing; Feick, Henning; Park, Yeonjoon; Weber, Eicke R.

    2002-04-15

    Carbon-doped GaN was grown by plasma-assisted molecular-beam epitaxy using carbon tetrachloride vapor as the dopant source. For moderate doping mainly acceptors were formed, yielding semi-insulating GaN. However at higher concentrations p-type conductivity was not observed, and heavily doped films (>5 x 10{sup 20} cm{sup -3}) were actually n-type rather than semi-insulating. Photoluminescence measurements showed two broad luminescence bands centered at 2.2 and 2.9 eV. The intensity of both bands increased with carbon content, but the 2.2 eV band dominated in n-type samples. Intense, narrow ({approx}6 meV) donor-bound exciton peaks were observed in the semi-insulating samples.

  18. Investigation of surface potential in the V-defect region of MBE Cd{sub x}Hg{sub 1−x}Te film

    SciTech Connect

    Novikov, V. A. Grigoryev, D. V.

    2015-03-15

    Atomic-force microscopy is used to investigate the distribution of the contact-potential difference (surface potential) in Cd{sub x}Hg{sub 1−x}Te epitaxial films grown by molecular-beam epitaxy. Modification of the solid-solution composition near the V-defect results in a variation in the contact-potential difference. It is shown that the solid-solution composition varies by ∼0.05 (2.5 at %) towards increasing mercury content in the V-defect region, and a region of mercury depletion by 0.36 at % is observed at the V-defect periphery. From analysis of the surface-potential distribution, it is shown that the Cd{sub x}Hg{sub 1−x}Te epitaxial film contains unform V-defects with a diameter less than 1 μm in addition to macroscopic V-defects.

  19. CMOS-compatible dense arrays of Ge quantum dots on the Si(001) surface: hut cluster nucleation, atomic structure and array life cycle during UHV MBE growth

    NASA Astrophysics Data System (ADS)

    Arapkina, Larisa V.; Yuryev, Vladimir A.

    2011-04-01

    We report a direct observation of Ge hut nucleation on Si(001) during UHV molecular beam epitaxy at 360°C. Nuclei of pyramids and wedges were observed on the wetting layer (WL) ( M × N) patches starting from the coverage of 5.1 Å and found to have different structures. Atomic models of nuclei of both hut species have been built as well as models of the growing clusters. The growth of huts of each species has been demonstrated to follow generic scenarios. The formation of the second atomic layer of a wedge results in rearrangement of its first layer. Its ridge structure does not repeat the nucleus. A pyramid grows without phase transitions. A structure of its vertex copies the nucleus. Transitions between hut species turned out to be impossible. The wedges contain point defects in the upper corners of the triangular faces and have preferential growth directions along the ridges. The derived structure of the {105} facet follows the paired dimer model. Further growth of hut arrays results in domination of wedges, and the density of pyramids exponentially drops. The second generation of huts arises at coverages >10 Å; new huts occupy the whole WL at coverages 14 Å. Nanocrystalline Ge 2D layer begins forming at coverages >14 Å.

  20. Spectroscopic determination of the bandgap crossover composition in MBE-grown AlxGa1-xAs

    SciTech Connect

    Fluegel, Brian; Alberi, Kirstin; Reno, John; Mascarenhas, Angelo

    2015-03-12

    The aluminum concentration dependence of the energies of the direct and indirect bandgaps arising from the Γ and X conduction bands are measured at 1.7 K in the semiconductor alloy AlxGa1-xAs. The composition at which the bands cross is determined from photoluminescence of molecular-beam epitaxy samples grown very close to crossover. The use of resonant laser excitation and the improved sample linewidth allows precise determination of the bound exciton transition energies. Moreover, photoluminescence excitation spectroscopy is used to measure the binding energies of the donor-bound excitons and the Γ free exciton binding energy.

  1. Correlation of growth temperature with stress, defect states and electronic structure in an epitaxial GaN film grown on c-sapphire via plasma MBE.

    PubMed

    Krishna, Shibin; Aggarwal, Neha; Mishra, Monu; Maurya, K K; Singh, Sandeep; Dilawar, Nita; Nagarajan, Subramaniyam; Gupta, Govind

    2016-03-21

    The relationship of the growth temperature with stress, defect states, and electronic structure of molecular beam epitaxy grown GaN films on c-plane (0001) sapphire substrates is demonstrated. A minimum compressively stressed GaN film is grown by tuning the growth temperature. The correlation of dislocations/defects with the stress relaxation is scrutinized by high-resolution X-ray diffraction and photoluminescence measurements which show a high crystalline quality with significant reduction in the threading dislocation density and defect related bands. A substantial reduction in yellow band related defect states is correlated with the stress relaxation in the grown film. Temperature dependent Raman analysis shows the thermal stability of the stress relaxed GaN film which further reveals a downshift in the E2 (high) phonon frequency owing to the thermal expansion of the lattice at elevated temperatures. Electronic structure analysis reveals that the Fermi level of the films is pinned at the respective defect states; however, for the stress relaxed film it is located at the charge neutrality level possessing the lowest electron affinity. The analysis demonstrates that the generated stress not only affects the defect states, but also the crystal quality, surface morphology and electronic structure/properties. PMID:26916430

  2. Droplet-mediated formation of embedded GaAs nanowires in MBE GaAs(1-x)Bi(x) films.

    PubMed

    Wood, Adam W; Collar, Kristen; Li, Jincheng; Brown, April S; Babcock, Susan E

    2016-03-18

    We have examined the morphology and composition of embedded nanowires that can be formed during molecular beam epitaxy of GaAs(1-x)Bi(x) using high angle annular dark field ('Z-contrast') imaging in an aberration-corrected scanning transmission electron microscope. Samples were grown in Ga-rich growth conditions on a stationary GaAs substrate. Ga-rich droplets are observed on the surface with lateral trails extending from the droplet in the [110] direction. Cross-sectional scanning transmission electron microscopy of the film reveals epitaxial nanowire structures of composition ∼GaAs embedded in the GaAs(1-x)Bi(x) epitaxial layers. These nanowires extend from a surface droplet to the substrate at a shallow angle of inclination (∼4°). They typically are 4 μm long and have a lens-shaped cross section with major and minor axes dimensions of 800 and 120 nm. The top surface of the nanowires exhibits a linear trace in longitudinal cross-section, across which the composition change from ∼GaAs to GaAs(1-x)Bi(x) appears abrupt. The bottom surfaces of the nanowires appear wavy and the composition change appears to be graded over ∼25 nm. The droplets have phase separated into Ga- and Bi-rich components. A qualitative model is proposed in which Bi is gettered into Ga droplets, leaving Bi depleted nanowires in the wakes of the droplets as they migrate in one direction across the surface during GaAs(1-x)Bi(x) film growth. PMID:26876494

  3. Electrical and structural properties of (Pd/Au) Schottky contact to as grown and rapid thermally annealed GaN grown by MBE

    NASA Astrophysics Data System (ADS)

    Nirwal, Varun Singh; Singh, Joginder; Gautam, Khyati; Peta, Koteswara Rao

    2016-05-01

    We studied effect of thermally annealed GaN surface on the electrical and structural properties of (Pd/Au) Schottky contact to Ga-polar GaN grown by molecular beam epitaxy on Si substrate. Current voltage (I-V) measurement was used to study electrical properties while X-ray diffraction (XRD) measurement was used to study structural properties. The Schottky barrier height calculated using I-V characteristics was 0.59 eV for (Pd/Au) Schottky contact on as grown GaN, which increased to 0.73 eV for the Schottky contact fabricated on 700 °C annealed GaN film. The reverse bias leakage current at -1 V was also significantly reduced from 6.42×10-5 A to 7.31×10-7 A after annealing. The value of series resistance (Rs) was extracted from Cheung method and the value of Rs decreased from 373 Ω to 172 Ω after annealing. XRD results revealed the formation of gallide phases at the interface of (Pd/Au) and GaN for annealed sample, which could be the reason for improvement in the electrical properties of Schottky contact after annealing.

  4. Defect energy levels in p-type GaAsBi and GaAs grown by MBE at low temperatures

    NASA Astrophysics Data System (ADS)

    Mooney, P. M.; Tarun, M. C.; Bahrami-Yekta, V.; Tiedje, T.; Lewis, R. B.; Masnadi-Shirazi, M.

    2016-06-01

    Deep level defects in p-type GaAs1‑x Bi x (x < 1%) and GaAs grown by molecular beam epitaxy at substrate temperatures of 330 °C and 370 °C have been characterized by deep level transient spectroscopy. We find that incorporating Bi into GaAs at 330 °C does not affect the total concentration of hole traps, which is ∼4 × 1016 cm‑3, comparable to the concentration of electron traps observed in Si-doped GaAsBi having a similar alloy composition. Increasing the growth temperature of the p-type GaAsBi (x = 0.8%) layer from 330 °C to 370 °C reduces the hole trap concentration by an order of magnitude. Moreover, the defects having near mid-gap energy levels that are the most efficient non-radiative recombination centers are present only in GaAsBi layers grown at the lower temperature. These new results are discussed in the context of previous measurements of n-type GaAs and GaAsBi layers grown under similar conditions.

  5. Development of MBE grown Pb-salt semiconductor lasers for the 8.0 to 15.0 micrometer spectral region

    NASA Technical Reports Server (NTRS)

    Miller, M. D.

    1981-01-01

    Diodes lasers are fabricated using multiple source molecular beam expitaxial growth of (PbSn)Te on BaF2 substrates. Methods for crystal growth, crystal transfer, and device fabrication by photolithographic techniques were developed. The lasers operate in the spectra range from 10 microns to 14 microns and at temperatures from 12K to 60K continuous wave and to 95 K pulsed.

  6. Improved growth of GaN layers on ultra thin silicon nitride/Si (1 1 1) by RF-MBE

    SciTech Connect

    Kumar, Mahesh; Roul, Basanta; Bhat, Thirumaleshwara N.; Rajpalke, Mohana K.; Misra, P.; Kukreja, L.M.; Sinha, Neeraj; Kalghatgi, A.T.; Krupanidhi, S.B.

    2010-11-15

    High-quality GaN epilayers were grown on Si (1 1 1) substrates by molecular beam epitaxy using a new growth process sequence which involved a substrate nitridation at low temperatures, annealing at high temperatures, followed by nitridation at high temperatures, deposition of a low-temperature buffer layer, and a high-temperature overgrowth. The material quality of the GaN films was also investigated as a function of nitridation time and temperature. Crystallinity and surface roughness of GaN was found to improve when the Si substrate was treated under the new growth process sequence. Micro-Raman and photoluminescence (PL) measurement results indicate that the GaN film grown by the new process sequence has less tensile stress and optically good. The surface and interface structures of an ultra thin silicon nitride film grown on the Si surface are investigated by core-level photoelectron spectroscopy and it clearly indicates that the quality of silicon nitride notably affects the properties of GaN growth.

  7. Phase transition on the Si(001) clean surface prepared in UHV MBE chamber: a study by high-resolution STM and in situ RHEED

    PubMed Central

    2011-01-01

    The Si(001) surface deoxidized by short annealing at T ~ 925°C in the ultrahigh vacuum molecuar beam epitaxy chamber has been in situ investigated using high-resolution scanning tunneling microscopy (STM)and redegreesected high-energy electron diffraction (RHEED. RHEED patterns corresponding to (2 × 1) and (4 × 4) structures were observed during sample treatment. The (4 × 4) reconstruction arose at T ≲ 600°C after annealing. The reconstruction was observed to be reversible: the (4 × 4) structure turned into the (2 × 1) one at T ≳ 600°C, the (4 × 4) structure appeared again at recurring cooling. The c(8 × 8) reconstruction was revealed by STM at room temperature on the same samples. A fraction of the surface area covered by the c(8 × 8) structure decreased, as the sample cooling rate was reduced. The (2 × 1) structure was observed on the surface free of the c(8 × 8) one. The c(8 × 8) structure has been evidenced to manifest itself as the (4 × 4) one in the RHEED patterns. A model of the c(8 × 8) structure formation has been built on the basis of the STM data. Origin of the high-order structure on the Si(001) surface and its connection with the epinucleation phenomenon are discussed. PACS 68.35.B-·68.37.Ef·68.49.Jk·68.47.Fg PMID:21711733

  8. CMOS-compatible dense arrays of Ge quantum dots on the Si(001) surface: hut cluster nucleation, atomic structure and array life cycle during UHV MBE growth

    PubMed Central

    2011-01-01

    We report a direct observation of Ge hut nucleation on Si(001) during UHV molecular beam epitaxy at 360°C. Nuclei of pyramids and wedges were observed on the wetting layer (WL) (M × N) patches starting from the coverage of 5.1 Å and found to have different structures. Atomic models of nuclei of both hut species have been built as well as models of the growing clusters. The growth of huts of each species has been demonstrated to follow generic scenarios. The formation of the second atomic layer of a wedge results in rearrangement of its first layer. Its ridge structure does not repeat the nucleus. A pyramid grows without phase transitions. A structure of its vertex copies the nucleus. Transitions between hut species turned out to be impossible. The wedges contain point defects in the upper corners of the triangular faces and have preferential growth directions along the ridges. The derived structure of the {105} facet follows the paired dimer model. Further growth of hut arrays results in domination of wedges, and the density of pyramids exponentially drops. The second generation of huts arises at coverages >10 Å; new huts occupy the whole WL at coverages ~14 Å. Nanocrystalline Ge 2D layer begins forming at coverages >14 Å. PMID:21711886

  9. Initial stage growth of GexSi1−x layers and Ge quantum dot formation on GexSi1−x surface by MBE

    PubMed Central

    2012-01-01

    Critical thicknesses of two-dimensional to three-dimensional growth in GexSi1−x layers were measured as a function of composition for different growth temperatures. In addition to the (2 × 1) superstructure for a Ge film grown on Si(100), the GexSi1−x layers are characterized by the formation of (2 × n) reconstruction. We measured n for all layers of Ge/GexSi1−x/Ge heterosystem using our software with respect to the video recording of reflection high-energy electron diffraction (RHEED) pattern during growth. The n reaches a minimum value of about 8 for clear Ge layer, whereas for GexSi1−x films, n is increased from 8 to 14. The presence of a thin strained film of the GexSi1−x caused not only the changes in critical thicknesses of the transitions, but also affected the properties of the germanium nanocluster array for the top Ge layer. Based on the RHEED data, the hut-like island form, which has not been previously observed by us between the hut and dome islands, has been detected. Data on the growth of Ge/GexSi1−x/Ge heterostructures with the uniform array of islands in the second layer of the Ge film have been received. PMID:23043796

  10. Gas-source MBE growth and n-type doping of AlGaAs using TEG, TEA, AsH 3 and Si 2H 6

    NASA Astrophysics Data System (ADS)

    Fujii, T.; Ando, H.; Sandhu, A.; Ishikawa, H.; Sugiyama, Y.

    1991-01-01

    We have studied gas-source molecular beam epitaxy (GSMBE) growth and n-type doping of AlGaAs using triethylgallium, triethylaluminum, arsine (AsH 3) and disilane (Si 2H 6), focusing on (1) the effect of substrate temperature (520-690°C) and AsH 3 flow rate (2-7 SCCM) on the carbon and oxygen incorporation of Al xGa 1- xAs ( x ˜ 0.28), and (2) the variation of the carrier concentration of n-type Al xGa 1- xAs ( x = 0-0.28) with Si 2H 6 flow rate (0.4-10 SCCM). The carbon concentration decreased with increasing substrate temperature up to 610°C, then increased with increasing substrate temperature using an AsH 3 flow rate of 2 SCCM. Below 610°C, an increase in AsH 3 flow rate resulted in a reduction in the carbon concentration. We obtained a carbon concentration of 1 × 10 18 cm -3 at a substrate temperature of 520°C and an AsH 3 flow rate of 7 SCCM. The addition of molecular hydrogen was found to further reduce the carbon concentration, and the lowest value obtained was 8.2 × 10 17 cm -3 at a substrate temperature of 520°C using 4 SCCM AsH 3 and 4.5 SCCM of molecular hydrogen. The oxygen concentration was not affected by the substrate temperature, but showed a slight decrease with increasing AsH 3 flow rate. The lowest oxygen concentration was 2.5 × 10 17 cm -3 at 7 SCCM AsH 3 flow rate. The variation of the hole concentration with growth conditions was similar to that observed for carbon. The 4.2 K photoluminescence was dominated by a free-to-bound emission having a full-width-at-half-maximum of 18 meV, which is thought to be related to shallow carbon acceptors. Si 2H 6 was shown to be a suitable cold n-type gaseous dopant source for GSMBE growth of AlGaAs. The carrier concentration of the n-type Al xGa 1- xAs ( x = 0-0.28) epilayer was reproducibly controlled between 5 × 10 17 and 2 × 10 18 cm -3.