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Sample records for photomask japan bacus

  1. Photomask and pattern programming manual

    NASA Technical Reports Server (NTRS)

    Kirschman, R. K.

    1978-01-01

    A user's manual for a set of computer programs written in FORTRAN for the layout and generation of photomasks is presented. A limited amount of related information on photomasks, their design, and use is included. Input to the programs includes data describing the photomask design. Possible outputs include plots of the layout and a magnetic tape for controlling generation of the photomask by a pattern generator.

  2. Wafer plane inspection evaluated for photomask production

    NASA Astrophysics Data System (ADS)

    Gallagher, Emily; Badger, Karen; Lawliss, Mark; Kodera, Yutaka; Azpiroz, Jaione Tirapu; Pang, Song; Zhang, Hongqin; Eugenieva, Eugenia; Clifford, Chris; Goonesekera, Arosha; Tian, Yibin

    2008-10-01

    Wafer Plane Inspection (WPI) is a novel approach to inspection, developed to enable high inspectability on fragmented mask features at the optimal defect sensitivity. It builds on well-established high resolution inspection capabilities to complement existing manufacturing methods. The production of defect-free photomasks is practical today only because of informed decisions on the impact of defects identified. The defect size, location and its measured printing impact can dictate that a mask is perfectly good for lithographic purposes. This inspection - verification - repair loop is timeconsuming and is predicated on the fact that detectable photomask defects do not always resolve or matter on wafer. This paper will introduce and evaluate an alternative approach that moves the mask inspection to the wafer plane. WPI uses a high NA inspection of the mask to construct a physical mask model. This mask model is used to create the mask image in the wafer plane. Finally, a threshold model is applied to enhance sensitivity to printing defects. WPI essentially eliminates the non-printing inspection stops and relaxes some of the pattern restrictions currently placed on incoming photomask designs. This paper outlines the WPI technology and explores its application to patterns and substrates representative of 32nm designs. The implications of deploying Wafer Plane Inspection will be discussed.

  3. Japan.

    ERIC Educational Resources Information Center

    Geiger, Rita; And Others

    The document offers practical and motivating techniques for studying Japan. Dedicated to promoting global awareness, separate sections discuss Japan's geography, history, culture, education, government, economics, energy, transportation, and communication. Each section presents a topical overview; suggested classroom activities; and easily…

  4. Japan.

    PubMed

    1989-02-01

    Japan consists of 3900 islands and lies off the east coast of Asia. Even though Japan is one of the most densely populated nations in the world, its growth rate has stabilized at .5%. 94% of all children go to senior high school and almost 90% finish. Responsibility for the sick, aged, and infirmed is changing from the family and private sector to government. Japan was founded in 600 BC and its 1st capital was in Nara (710-1867). The Portuguese, the 1st Westerners to make contact with Japan in 1542, opened trade which lasted until the mid 17th century. US Navy Commodore Matthew Perry forced Japan to reopen in 1854. Following wars with China and Russia in the late 1800s and early 1900s respectively, Japan took part in World Wars I and II. In between these wars Japan invaded Manchuria and China. The US dropped an atomic bomb on Hiroshima and Nagasaki and the Japanese surrendered in September, 1945 ending World War II (WWII). Following, WWII, the Allied Powers guided Japan's establishment as a nonthreatening nation and a democratic parliamentary government (a constitutional monarchy) with a limited defense force. Japan remains one of the most politically stable of all postwar democracies. The Liberal Democratic Party's Noboru Takeshita became prime minister in 1987. Japan has limited natural resources and only 19% of the land is arable. Japanese ingenuity and skill combine to produce one of the highest per hectare crop yields in the world. Japan is a major economic power, and its and the US economies are becoming more interdependent. Its exports, making up only 13% of the gross national product, mainly go to Canada and the US. Many in the US are concerned, however, with the trade deficit with Japan and are seeking ways to make trade more equitable. Japan wishes to maintain good relations with its Asian neighbors and other nations. The US and Japan enjoy a strong, productive relationship. PMID:12178004

  5. VUV spectrophotometry for photomasks characterization at 193 nm

    NASA Astrophysics Data System (ADS)

    Yang, Minghong; Leiterer, Jork; Gatto, Alexandre; Kaiser, Norbert; Höllein, Ingo; Teuber, Silvio; Bubke, Karsten

    2005-10-01

    This paper intends to develop a measurement system to characterize photomasks for 193 nm lithography applications. Based on the VUV spectrophotometer at the Fraunhofer IOF institute, some modifications have been addressed to fulfil these special measurements. Characterizations on photomasks have been successfully carried out, which show good correlations to simulations.

  6. Calibration of single particle sizing velocimeters using photomask reticles

    NASA Technical Reports Server (NTRS)

    Hirleman, E. D.; Holve, D. J.; Hovenac, E. A.

    1988-01-01

    The development of photomask reticle calibration standards for single particle instruments is discussed. The calibration method studied involves the use of photomask reticles where the particle artifacts are actually disks of chrome thin film in the clear field reticles produced by photolithography and etching processes. Consideration is given to various aspects of theory, design, and performance.

  7. Continuous improvement journey at Du Pont photomasks

    NASA Astrophysics Data System (ADS)

    Henderson, Robert K.

    1994-02-01

    This paper describes the history and experiences of Du Pont Photomasks in their efforts to integrate the continuous improvement philosophy and practices embodied in the Malcolm Baldrige National Quality Award criteria into their way of doing business. A case study of key learnings in this almost four year long process is presented. Specific topics discussed include the process applied to achieve ISO 9000 certification, the quality systems deployed in this effort, and the use of a balanced set of business and quality metrics to assess and improve upon performance.

  8. Japan.

    PubMed

    1987-02-01

    Japan is composed of 4 main islands and more than 3900 smaller islands and has 317.7 persons/square kilometer. This makes it one of the most densely populated nations in the world. Religion is an important force in the life of the Japanese and most consider themselves Buddhists. Schooling is free through junior high but 90% of Japanese students complete high school. In fact, Japan enjoys one of the highest literacy rates in the world. There are over 178 newspapers and 3500 magazines published in Japan and the number of new book titles issued each year is greater than that in the US. Since WW1, Japan expanded its influence in Asia and its holdings in the Pacific. However, as a direct result of WW2, Japan lost all of its overseas possessions and was able to retain only its own islands. Since 1952, Japan has been ruled by conservative governments which cooperate closely with the West. Great economic growth has come since the post-treaty period. Japan as a constitutional monarchy operates within the framework of a constitution which became effective in May 1947. Executive power is vested in a cabinet which includes the prime minister and the ministers of state. Japan is one of the most politically stable of the postwar democracies and the Liberal Democratic Party is representative of Japanese moderate conservatism. The economy of Japan is strong and growing. With few resources, there is only 19% of Japanese land suitable for cultivation. Its exports earn only about 19% of the country's gross national product. More than 59 million workers comprise Japan's labor force, 40% of whom are women. Japan and the US are strongly linked trading partners and after Canada, Japan is the largest trading partner of the US. Foreign policy since 1952 has fostered close cooperation with the West and Japan is vitally interested in good relations with its neighbors. Relations with the Soviet Union are not close although Japan is attempting to improve the situation. US policy is based on

  9. Japan.

    ERIC Educational Resources Information Center

    Jones, Savannah C.

    Materials for a secondary level, interdisciplinary social studies course on Japan are divided into introductory information, 14 classroom units, and study and evaluation materials. Introductory material includes lists of objectives and skills, an outline of Japanese history, and an explanation of Japan's name and flag. The units cover the…

  10. Japan

    ERIC Educational Resources Information Center

    Hawkins, John N.

    1986-01-01

    Analyzes the intergroup relations in Japanese society and Japan's educational system. Challenges the view that Japan is a homogeneous society by presenting the various forms of discrimination against Koreans, Ainu, and the burakumin. Suggests that despite ostracism and isolation, groups can affect public policy and achieve social advancement. (SA)

  11. Inline detection of Chrome degradation on binary 193nm photomasks

    NASA Astrophysics Data System (ADS)

    Dufaye, Félix; Sippel, Astrid; Wylie, Mark; García-Berríos, Edgardo; Crawford, Charles; Hess, Carl; Sartelli, Luca; Pogliani, Carlo; Miyashita, Hiroyuki; Gough, Stuart; Sundermann, Frank; Brochard, Christophe

    2013-09-01

    193nm binary photomasks are still used in the semiconductor industry for the lithography of some critical layers for the nodes 90nm and 65nm, with high volumes and over long periods. However, these 193nm binary photomasks can be impacted by a phenomenon of chrome oxidation leading to critical dimensions uniformity (CDU) degradation with a pronounced radial signature. If not detected early enough, this CDU degradation may cause defectivity issues and lower yield on wafers. Fortunately, a standard cleaning and repellicle service at the mask shop has been demonstrated as efficient to remove the grown materials and get the photomask CD back on target.Some detection methods have been already described in literature, such as wafer CD intrafield monitoring (ACLV), giving reliable results but also consuming additional SEM time with less precision than direct photomask measurement. In this paper, we propose another approach, by monitoring the CDU directly on the photomask, concurrently with defect inspection for regular requalification to production for wafer fabs. For this study, we focused on a Metal layer in a 90nm technology node. Wafers have been exposed with production conditions and then measured by SEM-CD. Afterwards, this photomask has been measured with a SEM-CD in mask shop and also inspected on a KLA-Tencor X5.2 inspection system, with pixels 125 and 90nm, to evaluate the Intensity based Critical Dimension Uniformity (iCDU) option. iCDU was firstly developed to provide feed-forward CDU maps for scanner intrafield corrections, from arrayed dense structures on memory photomasks. Due to layout complexity and differing feature types, CDU monitoring on logic photomasks used to pose unique challenges.The selection of suitable feature types for CDU monitoring on logic photomasks is no longer an issue, since the transmitted intensity map gives all the needed information, as shown in this paper. In this study, the photomask was heavily degraded after more than 18,000 300

  12. The ultimate chrome absorber in photomask making

    NASA Astrophysics Data System (ADS)

    Hashimoto, Masahiro; Iwashita, Hiroyuki; Kominato, Atsushi; Shishido, Hiroaki; Ushida, Masao; Mitsui, Hideaki

    2008-05-01

    193nm-immersion lithography is the most promising technology for 32nm-node device fabrication. A new Cr absorber (TFC) for 193-nm attenuated phase-shift blanks was developed to meet the photomask requirements without any additional process step, such as hardmask etching. TFC was introduced with a design concept of the vertical profile for shorter etching time, the over etching time reduction. As a result, the dry-etching time was dramatically improved by more than 20% shorter than the conventional Cr absorber (TF11) without any process changes. We confirmed that 150nm-resist thickness was possible by TFC. The 32nm technology-node requirement is fully supported by TFC with thinner CAR, such as resolution and CD performance.

  13. Resist charging effect correction function qualification for photomasks production

    NASA Astrophysics Data System (ADS)

    Sidorkin, Vadim; Finken, Michael; Wandel, Timo; Nakayamada, Noriaki; Cantrell, G. R.

    2014-10-01

    We quantitatively evaluate Nuflare's latest resist charging effect correction (CEC) model for advanced photomask production using e-beam lithography. Functionality of this CEC model includes the simulation of static and timedependent charging effects together with an improved calibration method. CEC model calibration is performed by polynomial fitting of image placement distortions induced by various beam scattering effects on a special test design with writing density variations. CEC model parameters can be fine tuned for different photomask blank materials facilitating resist charging compensation maps for different product layers. Application of this CEC model into production yields a significant reduction in photomask image placement (IP), as well as improving photomask overlay between critical neighbouring layers. The correlations between IP improvement facilitated by this CEC model and single mask parameters are presented and discussed. The layer design specifics, resist and blank materials, coupled with their required exposure parameters are observed to be the major influences on CEC model performance.

  14. Multilayer Microfluidic Devices Created From A Single Photomask

    SciTech Connect

    Kelly, Ryan T.; Sheen, Allison M.; Jambovane, Sachin R.

    2013-08-28

    The time and expense associated with high quality photomask production can discourage the creation of multilayer microfluidic devices, as each layer currently requires a separate photomask. Here we describe an approach in which multilayer microfabricated devices can be created from a single photomask. The separate layers and their corresponding alignment marks are arranged in separate halves of the mask for two layer devices or quadrants for four layer devices. Selective exposure of the photomask features and rotation of the device substrate between exposures result in multiple copies of the devices on each wafer. Subsequent layers are aligned to patterned features on the substrate with the same alignment accuracy as when multiple photomasks are used. We demonstrate this approach for fabricating devices employing multilayer soft lithography (MSL) for pneumatic valving. MSL devices containing as many as 5 layers (4 aligned fluidic layers plus a manually aligned control layer) were successfully created using this approach. Device design is also modularized, enabling the presence or absence of features as well as channel heights to be selected independently from one another. The use of a single photomask to create multilayer devices results in a dramatic savings of time and/or money required to advance from device design to completed prototype.

  15. Photomask repair using low-energetic electrons

    NASA Astrophysics Data System (ADS)

    Edinger, K.; Wolff, K.; Spies, P.; Luchs, T.; Schneider, H.; Auth, N.; Hermanns, Ch. F.; Waiblinger, M.

    2015-10-01

    Mask repair is an essential step in the mask manufacturing process as the extension of 193nm technology and the insertion of EUV are drivers for mask complexity and cost. The ability to repair all types of defects on all mask blank materials is crucial for the economic success of a mask shop operation. In the future mask repair is facing several challenges. The mask minimum features sizes are shrinking and require a higher resolution repair tool. At the same time mask blanks with different new mask materials are introduced to optimize optical performance and long term durability. For EUV masks new classes of defects like multilayer and phase defects are entering the stage. In order to achieve a high yield, mask repair has to cover etch and deposition capabilities and must not damage the mask. We will demonstrate in this paper that low energetic electron-beam (e-beam)-based mask repair is a commercially viable solution. Therefore we developed a new repair platform called MeRiT® neXT to address the technical challenges of this new technology. We will analyze the limits of the existing as well as lower energetic electron induced repair technologies theoretically and experimentally and show performance data on photomask reticles. Based on this data, we will give an outlook to future mask repair technology.

  16. Binary 193nm photomasks aging phenomenon study

    NASA Astrophysics Data System (ADS)

    Dufaye, Félix; Sartelli, Luca; Pogliani, Carlo; Gough, Stuart; Sundermann, Frank; Miyashita, Hiroyuki; Hidenori, Yoshioka; Charras, Nathalie; Brochard, Christophe; Thivolle, Nicolas

    2011-05-01

    193nm binary photomasks are still used in the semiconductor industry for the lithography of some critical layers for the nodes 90nm and 65nm, with high volumes and over long period. These 193nm binary masks seem to be well-known but recent studies have shown surprising degrading effects, like Electric Field induced chromium Migration (EFM) [1] or chromium migration [2] [3] . Phase shift Masks (PSM) or Opaque MoSi On Glass (OMOG) might not be concerned by these effects [4] [6] under certain conditions. In this paper, we will focus our study on two layers gate and metal lines. We will detail the effects of mask aging, with SEM top view pictures revealing a degraded chromium edge profile and TEM chemical analyses demonstrating the growth of a chromium oxide on the sidewall. SEMCD measurements after volume production indicated a modified CD with respect to initial CD data after manufacture. A regression analysis of these CD measurements shows a radial effect, a die effect and an isolated-dense effect. Mask cleaning effectiveness has also been investigated, with sulphate or ozone cleans, to recover the mask quality in terms of CD. In complement, wafer intrafield CD measurements have been performed on the most sensitive structure to monitor the evolution of the aging effect on mask CD uniformity. Mask CD drift have been correlated with exposure dose drift and isolated-dense bias CD drift on wafers. In the end, we will try to propose a physical explanation of this aging phenomenon and a solution to prevent from it occurring.

  17. Two-fluid cleaning technology for advanced photomask

    NASA Astrophysics Data System (ADS)

    Kikuchi, Tsutomu; Kobayashi, Nobuo; Kurokawa, Yoshiaki; Hirose, Harumichi; Nonaka, Mikio

    2009-04-01

    Along with the increased miniaturization of electronic devices, two-fluid cleaning technology is garnering the spotlight as a solution for the manufacturing process of Photomask. This is because it is now known that implementing energy control of the particles that are sprayed on the substrate allows cleaning of miniature patterns. However, it is not yet clear just how miniature of a pattern is cleanable with two-fluid cleaning technology. This study discusses mechanisms to miniaturize the droplets created by a two-fluid nozzle. In addition, this study also considers the impact of droplet size on pattern damage to the Photomask and speaks on the potential for applying two-fluid cleaning technology in the future.

  18. Film stress and geometry effects in chrome photomask cleaning damage

    NASA Astrophysics Data System (ADS)

    Alpay, H. Ufuk; Wood, James L.; Kalk, Franklin D.

    1997-02-01

    As design rules shrink, photomask blank material characteristics play a more significant role in successful mask fabrication. Chromium-based absorber film stress is a key material attribute in determining mask quality. A photomask is cleaned several times during manufacture by various techniques incorporating part or all of the following processes: strong acids, bases, high pressure sprays, mechanical brushes, sonic agitation. In such aggressive environments, electrostatic discharge damage (ESD) and mechanical damage can occur. Chromium-based film dependence on sputter deposition parameters was studied here. Photoblank flatness, measured by optical interferometry, was used to quantify the stress. Blanks with various chrome film stresses were patterned with features combining different geometry types. The masks were then subjected to multiple cleaning cycles and inspected after each cycle. The results demonstrate how mask damage is related to the film mechanical properties (which are controllable by sputter deposition parameters) and the pattern itself (which is not controllable).

  19. Selective removal of persistent particles with no photomask damage

    NASA Astrophysics Data System (ADS)

    Robinson, Tod; Bozak, Ron; White, Roy; Archuletta, Mike; Lee, David

    2009-04-01

    Makers and users of advanced technology photomasks have seen increased difficulties with the removal of persistent, or stubborn, nano-particle contamination. Shrinking pattern geometries, and new mask clean technologies to minimize haze, have both increased the number of problems and loss of mask yield due to these non-removable nano-particles. A novel technique (BitCleanTM) has been developed using a scanning probe microscope system originally designed for nanomachining photomask defect repair. Progress in the technical development of this approach into a manufacture-able solution is reviewed and its effectiveness is shown in selectively removing adherent particles without touching surrounding sensitive structures. Methods for generating targeted edge test particles along with considerations for removal of particles in various pattern geometries and materials are also discussed.

  20. Advantages of using the CAR for photomask manufacturing

    NASA Astrophysics Data System (ADS)

    Kondoh, Takehiro; Itoh, Masamitsu; Taniguchi, Rikiya; Ohtsubo, Kyoh; Sakai, Mari; Watanabe, Hidehiro

    2001-09-01

    This report shows characteristics of the chemical amplified positive-tone resist (CAR) we have developed for 50keV electron beam (E-beam) mask writing system. The CAR includes newly developed polymer. Including the polymer, CD change is negligible small even if exposed mask is left in vacuum for dozens of hour. 0.4, 0.3, 0.2 micrometers L&S resist pattern profiles at a dose of 7.5micrometers C/cm2 and Cr pattern profiles after reactive ion etching are printed. Dependence on PEB temperature is 3.4 nm / degree(s)C. As post coating delay effect (PCD), CD change can not be observed for 53 days. And characteristics of the CAR were compared with that of ZEP7000 (Nippon Zeon Co., Ltd.). Dose latitude of the CAR is about two times of that of the other. Writing time of photomask with the CAR is about half of that the other. Above mentioned, the CAR has ability for photomasks manufacturing. So, we have succeed in making 0.18micrometers design rule photomasks with the CAR and 50keV EB writing system.

  1. Photomask design method for pattern-integrated interference lithography

    NASA Astrophysics Data System (ADS)

    Leibovici, Matthieu C. R.; Gaylord, Thomas K.

    2016-01-01

    Pattern-integrated interference lithography (PIIL) combines multibeam interference lithography and projection lithography simultaneously to produce two-dimensional (2-D) and three-dimensional (3-D) periodic-lattice-based microstructures in a rapid, single-exposure step. Using a comprehensive PIIL vector model and realistic photolithographic conditions, PIIL exposures for a representative photonic-crystal (PhC) 90 deg bend waveguide are simulated in the volume of the photoresist film. The etched structures in the underlying substrate are estimated as well. Due to the imperfect integration of the photomask within the interference pattern, the interference pattern is locally distorted, thereby impacting the PhC periodic lattice and potentially the device performance. To mitigate these distortions, a photomask optimization method for PIIL is presented in this work. With an improved photomask, pillar-area and pillar-displacement errors in the vicinity of the waveguide are reduced by factors of 3.3 and 2.7, respectively. Furthermore, calculated transmission spectra show that the performance of the PIIL-produced PhC device is as good as that of its idealized equivalent.

  2. Photomask blanks enhancement for the laser reticle writer

    NASA Astrophysics Data System (ADS)

    Kobayashi, Hideo; Asakawa, Keishi; Yokoya, Yasunori

    1995-07-01

    The laser writer (CORE) has come to the front for advanced reticle fabrication so that photomask blanks enhancement is much more to be desired for the application. We have investigated novel techniques to bring out photomask blanks potential to expand process windows for the laser writer application, which included optimization of resist coating thickness by studying standing wave effect, optimization of soft-baking by studying resist behavior to soft-baking temperature, and optimization of pretreatment by studying resist adhesion characteristic to chromium oxide based film and molybdenum silicide based film. We have also explored very basic features of several resists in a comparison between the most popular OCG-895i and new candidates under an optimized coating thickness and soft-baking temperature respectively for each resist. This paper describes details of our findings on novel techniques for photomask blanks enhancement, and a comparison result of several resists in very basic features, in order to expand process windows to meet critical dimension performance requirements of advanced reticle fabrication by the laser writer.

  3. Photomask cleaning process improvement to minimize ArF haze

    NASA Astrophysics Data System (ADS)

    Graham, Michael; McDonald, Andrew

    2008-04-01

    Growth of "haze" defects on photomasks exposed in ArF lithography is recognized as a serious problem. Haze defects that have grown to detectable sizes can be analysed in situ by techniques such as EDX or Raman, but to analyze at the photomask manufacturing stage requires extraction of residues by solution in DI water. The effect of extraction conditions, including surface area and material, water volume, time, and temperature, has been studied. A standard method to compare residual ion levels is proposed. Various methods for reducing residual ion levels from the photomask cleaning process have been published. These include SPM reduction, oxygen plasma, SC1 dilution, Megasonic agitation, hot rinse, UV exposure, thermal bake, ozone water, ozone gas, and hydrogenated water. Critical parameters for the cleaning process, besides residual ion levels and contamination removal efficiency, include CD shift, AR/chrome damage, scatter bar damage, and on phase shift masks, the change in phase and transmission. An optimized process combining conventional and novel techniques is described. Data is presented to show the importance of controlling all resist strip and clean processes, not just the final clean. It has achieved sulphate levels of 0.2ng/cm2 (well below the critical level for haze growth), as well as improved results for the other critical parameters. This process has been demonstrated to allow ArF exposure of large numbers of wafers without the appearance of haze defects.

  4. Qualification of BitClean technology in photomask production

    NASA Astrophysics Data System (ADS)

    Robinson, Tod; White, Roy; Bozak, Ron; Archuletta, Mike; Brinkley, David; Yi, Daniel

    2010-09-01

    Makers and users of advanced technology photomasks have seen increased difficulties with the removal of persistent, or stubborn, nano-particle contamination. Shrinking pattern geometries, and new mask clean technologies to minimize haze, have both increased the number of problems and loss of mask yield due to these non-removable nano-particles. A novel technique (BitCleanTM) has been developed using the MerlinTM platform, a scanning probe microscope system originally designed for nanomachining photomask defect repair. Progress in the technical development of this approach into a manufacture-able solution is reviewed and its effectiveness is shown in selectively removing adherent particles without touching surrounding sensitive structures. Results will also be reviewed that were generated in the qualification and acceptance of this new technology in a photomask production environment. These results will be discussed in their relation to the minimum particle size allowed on a given design, particle removal efficiency per pass of the NanoBitTM (PREPP), and the resultant average removal throughput of particles unaffected by any other available mask clean process.

  5. Total-internal-reflection-based photomask for large-area photolithography

    NASA Astrophysics Data System (ADS)

    Hung, Shao-Kang; Lin, Kung-Hsuan; Chen, Cheng-Lung; Chou, Chen-Hsun; Lin, You-Chuan

    2016-05-01

    Photolithography has been widely implemented with a photomask in contact or in close proximity to the photoresist layer. The flatness of the substrates is a crucial factor to guarantee the quality of the entire patterned photoresist (PR) layer especially for large-area photolithography. However, some substrates, such as sapphire wafers, do not possess highly uniform thickness as silicon wafer does. In this work, we demonstrate that a flexible polydimethylsiloxane (PDMS) photomask with optical total-internal-reflection structure can effectively circumvent this problem for mass production. Different from conventional photomask that the light is blocked by the patterned reflective/absorbing materials, the distributions of light intensity on the PR is engineered by the geometric structure of the transparent PDMS photomask. We demonstrate that 4 in. patterned sapphire wafers can be successfully fabricated by using this PDMS photomask, which can be easily integrated into the present techniques in industry for mass production of substrates for GaN-based optoelectronic devices.

  6. Simulation-based photomask qualification using i-Virtual Stepper

    NASA Astrophysics Data System (ADS)

    Taylor, Darren; Morgan, Ray; Hu, Susan

    2005-11-01

    Mask manufacturers and mask users continue to pursue improvements in mask inspection and qualification processes driving standards to guarantee the highest performance of advanced photomasks while maintaining a high degree of predictability of turn-around-time. Simulation-based defect analysis and dispositioning has become an area of much interest for both mask manufacturers and mask users. Repairing only the defects that impact wafer level performance (lithographically significant) improves both mask cycle time and eliminates unnecessary and costly repairs. Mask maker and mask users can utilize defect simulation as a common standard by which to benchmark the quality of results. We report in this paper the results of a joint evaluation of the i-Virtual Stepper system (i-VSS) the automated simulation based defect dispositioning software solution in an advanced photomask qualification flow. Results discussed include the optimization and automation of the mask inspection flow using i-VSS, simulation accuracy comparisons of i-VSS versus AIMS versus wafer printability for binary and phase shifting masks at 130nm, 90nm, and 65nm technology nodes, and a comparison of the iVirtual Stepper system's automated defect severity scoring (ADSS) versus manual defect dispositioning.

  7. Study of stress birefringence for 193-nm immersion photomasks

    NASA Astrophysics Data System (ADS)

    Cotte, Eric; Selle, Michael; Bubke, Karsten; Teuber, Silvio

    2005-06-01

    The goal of the present study was to investigate and quantify reticle stress birefringence in exposure conditions. Birefringence can arise in fused silica photomask substrates due to their state of stress, and cause optical effects such as phase front distortion, ray bifurcation, and polarization changes. These effects potentially produce image blurring and illumination non-uniformity, leading to lower resolution and CD variations, respectively. The main sources of substrate stress studied were the absorber stack, the mounting of a pellicle, and the impact of initial reticle bow when chucking in an exposure tool. Jones calculus was used to relate birefringence at discrete locations in the reticle, derived from the state of stress, to the net birefringence experienced by light passing through the mask. Experimentally-obtained birefringence data as well as analytical calculations of stress birefringence caused by known states of stress were used to validate the models. These results can then be compared to photomask birefringence specifications or employed in optical simulations to determine the precise impact of this substrate stress birefringence.

  8. Photopatterned Polydiacetylene Images Using a DNA Bio-Photomask.

    PubMed

    Jung, Yun Kyung; Jung, Cheulhee; Park, Hyun Gyu

    2016-06-22

    We describe a novel strategy to fabricate a well-defined polydiacetylene (PDA) supramolecular pattern on polyvinylidene fluoride (PVDF) membrane utilizing a DNA bio-photomask. By focusing on that, the absorption spectrum of DNA molecules having a λmax at 260 nm overlaps with the wavelength at which the photopolymerization of the diacetylene monomer occurs, DNA molecules are used to define specific patterns on PVDF membranes coated with diacetylene lipids by shielding the applied 254 nm UV light and consequently preventing the photopolymerization of the lipids. As a result, the DNA-covered regions retain the original white color on the membrane while the regions uncovered by DNA molecules undergo the color change to blue through the photopolymerization by 254 nm UV irradiation. On the basis of the selective illumination through a DNA photomask, we precisely manufacture specific patterns using a microarray spotting method and also demonstrate the capability of this strategy to achieve a novel colorimetric DNA sensor without any complicated process. PMID:27225667

  9. Improved PBS process for e-beam photomask lithography

    NASA Astrophysics Data System (ADS)

    Shen, Wayne P.; Marra, James W.; Van Den Broeke, Douglas J.

    1996-12-01

    An improved PBS process has been developed and tested for the photomask production. Significant improvements in CD uniformity (3(sigma) < 40 nm over 6' plates) and CD meant- to-target control (< 30 nm) have been achieved through a specially treated puddle development. A low-temperature bake (95 degree(s)C, 30 minutes) was utilized for better linearity while the resolution was 0.5 micrometers for the regular process and as low as 0.35 micrometers for the ghosting process. Defect densities on production plates have been greatly improved to a level lower than our normal production process. The new process is not limited by any specific type of processor, therefore it can be implemented into current production lines easily. It is expected that this new process will meet advanced specs for 256 M DRAM (with 0.25 micrometers design rule) and extend the life of the PBS production line for another 3 - 4 years.

  10. Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

    NASA Astrophysics Data System (ADS)

    Lu, C. L.; Yu, C. H.; Liu, W. H.; Hsu, Luke; Chin, Angus; Lee, S. C.; Yen, Anthony; Lee, Gaston; Dress, Peter; Singh, Sherjang; Dietze, Uwe

    2010-09-01

    The fundamentals of droplet-based cleaning of photomasks are investigated and performance regimes that enable the use of binary spray technologies in advanced mask cleaning are identified. Using phase Doppler anemometry techniques, the effect of key performance parameters such as liquid and gas flow rates and temperature, nozzle design, and surface distance on droplet size, velocity, and distributions were studied. The data are correlated to particle removal efficiency (PRE) and feature damage results obtained on advanced photomasks for 193-nm immersion lithography.

  11. Design-Data Based Inspection Of Photomasks And Reticles

    NASA Astrophysics Data System (ADS)

    Yabumoto, Seiichi; Arai, Tetsuyuki; Fujimori, Yoshihiko; Azuma, Toru

    1986-08-01

    A New automatic design-based inspection system called Nikon RMX has been developed. With its unique algorithm of comparing photomasks and reticles with their design data, good defect detection sensitivity and low false-defect detection are achieved. Firstly, the design data are converted into Nikon Format Data and stored in a magnetic disc device. At this time, more than one files can be merged together. A magnified image of the sample on the X-Y stage is converted to a bit-pattern image. Synchronized to the image of sample, Nikon Format Data are transferred from the disc, and a bit-pattern image of design data is generated on the frame memory. The window moves pixel by pixel in both design and sample bit-patterns. Each minute character (corner, step & isolated pattern) at the same window position is extracted by using so called Template-matching method, and compared. If the characters of the two bit-patterns are different, it means that the sample has a defect. Many kinds of templates are provided for defects on pattern edge (of 0°, 45°, 90° & any angle), defects at corner and isolated defects. Another unique point of this system is automatic resizing function (enlarging or shrinking of pattern). With this function, design-image can be matched to the sample-image precisely. All of defect analysis is performed by hardware-logic, so very fast inspection is possible.

  12. Plasma etching of chromium films in the fabrication of photomasks

    NASA Astrophysics Data System (ADS)

    Coleman, Thomas P.; Buck, Peter D.

    1995-12-01

    To meet the advanced CD uniformity and resolution requirements of state-of-the-art maskmaking, dry chrome etch processing may be required. Dry etching is a more anisotropic process, significantly reducing etch undercut. The absence of undercutting allows the lithographer to image the resist at the iso-focal point, eliminating the need to underexpose to maintain CDs. Also, dry etch parameters can be precisely controlled via a microprocessor- controlled etch system with a highly accurate parameter-metering system that ensures greater process control. Using design-of-experiment methodologies, a chrome plasma etch process (using OCG-895i) was developed. This work proves the feasibility of plasma etching chromium patterns on photomasks. The results show an etch that has excellent uniformity, is anisotropic, and has excellent edge quality. Also, resist selectivity is high for the etching of thin chrome films. SEM results show a significant reduction in the bias needed to achieve nominal CDs. As with many dry etch processes, loading and microloading effects (i.e., localized pattern density effect on etch rates) are a concern. Initial investigations of loading and microloading effects were conducted. Results suggest that due to the high anisotropy of the etch, microloading is not an issue. However, plate loading (or the amount of chrome removed) increases etch times and can result in radial etch patterns. Loading effects must be minimized or eliminated to optimize etch uniformity.

  13. The large contour data generation from divided image of photomask pattern of 32 nm and beyond

    NASA Astrophysics Data System (ADS)

    Murakawa, Tsutomu; Ogiso, Yoshiaki; Iwai, Toshimichi; Matsumoto, Jun; Nakamura, Takayuki

    2010-05-01

    The application of Mask CD-SEM for process management of photomask using two dimensional measurements as photomask patterns become smaller and more complex, [1]. Also, WPI technology application using an optical Mask inspection tool simulates wafer plane images using photomask images [2]. In order to simulate the MEEF influence for aggressive OPC and High-end photomask patterns in 32nm node and beyond, a requirement exists for wide Field of View (FOV) GDS data and tone information generated from high precision SEM images. In light of these requirements, we developed a GDS data extraction algorithm with sub-nanometer accuracy using wide FOV images, for example, greater than 10um square. As a result, we over come the difficulty of generating large contour data without the distortion that is normally associated with acquired SEM images. Also, it will be shown that the evaluation result can be effective for 32 nm applications and beyond using Mask CD-SEM E3620 manufactured by Advantest. On the other hand, we investigate the application example of the wide FOV GDS data. In order to easily compare the acquired GDS data with design data, we explain the separate algorithm with three layer structures for Tri-tone (Ternary) photomask pattern, consisting of an outer pattern and another pattern.

  14. The method of quartz damage recovery in the photomask repair process

    NASA Astrophysics Data System (ADS)

    Namkung, Hoon; Kim, MunSik; Park, EuiSang; Jung, HoYong; Kim, SangPyo; Yim, DongGyu

    2015-07-01

    As the pattern size became gradually smaller, the defect detectability of the photomask inspection tool was more improved. For these reasons, we have to repair various defects more precisely. By improving the mask yield through the repair process, we can reduce the cost of mask fabrication. In this study, we studied the defect called quartz damage which distorts the AIMSTM (Arial Image Measurement System) intensity of the repaired pattern and causes the scrap of the photomask. The quartz damage is generally observed when the abnormal defects like particles were repaired in the poor repairing condition. The quartz damage occasionally results in repair errors and affects the AIMS intensity. Currently there is no clear solution for recovering the quartz damage. As a result, it is very difficult to get the high quality photomask if the quartz damage is generated on the photomask. Therefore, it is important to find a method of recovering the quartz damage for producing the high quality photomask. In this paper, we demonstrated that the quartz damage can be recovered through the TEOS (Tetraethoxysilane) gas deposition. Also we investigated the effect on the recovery of the quartz damage of various parameters such as the type and the depth of the quartz damage as well as the repair conditions of the TEOS gas deposition.

  15. Best-practice evaluation-methods for wafer-fab photomask-requalification inspection tools

    NASA Astrophysics Data System (ADS)

    Cho, Chan Seob; Mungmode, Ashish; Taylor, Ron; Cho, David; Koh, Hui Peng

    2014-10-01

    Requalifying semiconductor photomasks remains critically important and is increasingly challenging for 20nm and 14nm node logic reticles. Patterns are becoming more complex on the photomask, and defect sensitivity requirements are more stringent than ever before. Reticle inspection tools are equally important for effective process development and the successful ramp and sustained yield for high volume manufacturing. The inspection stages considered were: incoming inspection to match with Mask Shop Outgoing result and to detect defects generated during transport; requalification by routine cycle inspection to detect Haze and any other defects; and inspection by in-house or Mask shop at the post cleaning. There are many critical capability and capacity factors for the decision for best inspection tool and strategy for high volume manufacturing, especially objective Lens NA, wavelength, power, pixel size, throughput, full-automation inspection linked with Overhead Transport, algorithm application, engineering application function, and inspection of PSM and OMOG . These tools are expensive but deliver differentiated value in terms of performance and throughput as well as extendibility. Performing a thorough evaluation and making a technically sound choice which explores these many factors is critical for success of a fab. This paper examines the methodology for evaluating two different photomask inspection tools. The focus is on ensuring production worthiness on real and advanced product photomasks requiring accurate evaluation of sensitivity, throughput, data analysis function and engineering work function on those product photomasks. Photomasks used for data collection are production reticles, PDM(Program defect Mask), SiN spray defect Reticle which is described that evaluates how the tools would perform on a contaminated plate.

  16. Aerial imaging technology for photomask qualification: from a microscope to a metrology tool

    NASA Astrophysics Data System (ADS)

    Garetto, Anthony; Scherübl, Thomas; Peters, Jan Hendrik

    2012-09-01

    Photomasks carry the structured information of the chip designs printed with lithography scanners onto wafers. These structures, for the most modern technologies, are enlarged by a factor of 4 with respect to the final circuit design, and 20-60 of these photomasks are needed for the production of a single completed chip used, for example, in computers or cell phones. Lately, designs have been reported to be on the drawing board with close to 100 of these layers. Each of these photomasks will be reproduced onto the wafer several hundred times and typically 5000-50 000 wafers will be produced with each of them. Hence, the photomasks need to be absolutely defect-free to avoid any fatal electrical shortcut in the design or drastic performance degradation. One well-known method in the semiconductor industry is to analyze the aerial image of the photomask in a dedicated tool referred to as Aerial Imaging Measurement System, which emulates the behavior of the respective lithography scanner used for the imaging of the mask. High-end lithography scanners use light with a wavelength of 193 nm and high numerical apertures (NAs) of 1.35 utilizing a water film between the last lens and the resist to be illuminated (immersion scanners). Complex illumination shapes enable the imaging of structures well below the wavelength used. Future lithography scanners will work at a wavelength of 13.5 nm [extreme ultraviolet (EUV)] and require the optical system to work with mirrors in vacuum instead of the classical lenses used in current systems. The exact behavior of these systems is emulated by the Aerial Image Measurement System (AIMS™; a Trademark of Carl Zeiss). With these systems, any position of the photomask can be imaged under the same illumination condition used by the scanners, and hence, a prediction of the printing behavior of any structure can be derived. This system is used by mask manufacturers in their process flow to review critical defects or verify defect repair

  17. Photomask etch system and process for 10nm technology node and beyond

    NASA Astrophysics Data System (ADS)

    Chandrachood, Madhavi; Grimbergen, Michael; Yu, Keven; Leung, Toi; Tran, Jeffrey; Chen, Jeff; Bivens, Darin; Yalamanchili, Rao; Wistrom, Richard; Faure, Tom; Bartlau, Peter; Crawford, Shaun; Sakamoto, Yoshifumi

    2015-10-01

    While the industry is making progress to offer EUV lithography schemes to attain ultimate critical dimensions down to 20 nm half pitch, an interim optical lithography solution to address an immediate need for resolution is offered by various integration schemes using advanced PSM (Phase Shift Mask) materials including thin e-beam resist and hard mask. Using the 193nm wavelength to produce 10nm or 7nm patterns requires a range of optimization techniques, including immersion and multiple patterning, which place a heavy demand on photomask technologies. Mask schemes with hard mask certainly help attain better selectivity and hence better resolution but pose integration challenges and defectivity issues. This paper presents a new photomask etch solution for attenuated phase shift masks that offers high selectivity (Cr:Resist > 1.5:1), tighter control on the CD uniformity with a 3sigma value approaching 1 nm and controllable CD bias (5-20 nm) with excellent CD linearity performance (<5 nm) down to the finer resolution. The new system has successfully demonstrated capability to meet the 10 nm node photomask CD requirements without the use of more complicated hard mask phase shift blanks. Significant improvement in post wet clean recovery performance was demonstrated by the use of advanced chamber materials. Examples of CD uniformity, linearity, and minimum feature size, and etch bias performance on 10 nm test site and production mask designs will be shown.

  18. The study of develop optimization to control various resist defect in Photomask fabrication

    NASA Astrophysics Data System (ADS)

    Lim, JongHoon; Kim, ByungJu; Son, JaeSik; Park, EuiSang; Kim, SangPyo; Yim, DongGyu

    2015-07-01

    To reduce the pattern size in photomask is an inevitable trend because of the minimization of chip size. So it makes a big challenge to control defects in photomask industry. Defects below a certain size that had not been any problem in previous technology node are becoming an issue as the patterns are smaller. Therefore, the acceptable tolerance levels for current defect size and quantity are dramatically reduced. Because these defects on photomask can be the sources of the repeating defects on wafer, small size defects smaller than 200nm should not be ignored any more. Generally, almost defects are generated during develop process and etch process. Especially it is difficult to find the root cause of defects formed during the develop process because of their various types and very small size. In this paper, we studied how these small defects can be eliminated by analyzing the defects and tuning the develop process. There are 3 types of resist defects which are named as follows. The first type is `Popcorn' defect which is mainly occurred in negative resist and exists on the dark features. The second type is `Frog eggs' defect which is occurred in 2nd process of HTPSM and exists on the wide space area. The last type is `Spot' defect which also exists on the wide space area. These defects are generally appeared on the entire area of a plate and the number of these defects is about several hundred. It is thought that the original source is the surface's hydrophilic state before develop process or the incongruity between resist and developer. This study shows that the optimizing the develop process can be a good solution for some resist defects.

  19. Sensitivity analysis for OMOG and EUV photomasks characterized by UV-NIR spectroscopic ellipsometry

    NASA Astrophysics Data System (ADS)

    Heinrich, A.; Dirnstorfer, I.; Bischoff, J.; Meiner, K.; Richter, U.; Mikolajick, T.

    2013-09-01

    We investigated the potentials, applicability and advantages of spectroscopic ellipsometry (SE) for the characterization of high-end photomasks. The SE measurements were done in the ultraviolet-near infrared (UVNIR) wavelength range from 300 nm to 980 nm, at angle of incidences (AOI) between 10 and 70° and with a microspot size of 45 x 10 μm2 (AOI=70°). The measured Ψ and 𝛥 spectra were modeled using the rigorous coupled wave analysis (RCWA) to determine the structural parameters of a periodic array, i.e. the pitch and critical dimension (CD). Two different types of industrial photomasks consisting of line/space structures were evaluated, the reflecting extreme ultraviolet (EUV) and the transmitting opaque MoSi on glass (OMOG) mask. The Ψ and 𝛥 spectra of both masks show characteristic differences, which were related to the Rayleigh singularities and the missing transmission diffraction in the EUV mask. In the second part of the paper, a simulation based sensitivity analysis of the Fourier coefficients α and β is presented, which is used to define the required measurement precision to detect a CD deviation of 1%. This study was done for both mask types to investigate the influence of the stack transmission. It was found that sensitivities to CD variations are comparable for OMOG and EUV masks. For both masks, the highest sensitivities appear close to the Rayleigh singularities and significantly increase at very low AOI. To detect a 1% CD deviation for pitches below 150 nm a measurement precision in the order of 0.01 is required. This measurement precision can be realized with advanced optical hardware. It is concluded that UV-NIR ellipsometry is qualified to characterize photomasks down to the 13 nm technology node in 2020.

  20. Improved photomask accuracy with a high-productivity DUV laser pattern generator

    NASA Astrophysics Data System (ADS)

    Öström, Thomas; Måhlén, Jonas; Karawajczyk, Andrzej; Rosling, Mats; Carlqvist, Per; Askebjer, Per; Karlin, Tord; Sallander, Jesper; Österberg, Anders

    2006-10-01

    A strategy for sub-100 nm technology nodes is to maximize the use of high-speed deep-UV laser pattern generators, reserving e-beam tools for the most critical photomask layers. With a 248 nm excimer laser and 0.82 NA projection optics, the Sigma7500 increases the application space of laser pattern generators. A programmable spatial light modulator (SLM) is imaged with partially coherent optics to compose the photomask pattern. Image profiles are enhanced with phase shifting in the pattern generator, and features below 200 nm are reliably printed. The Sigma7500 extends the SLM-based architecture with improvements to CD uniformity and placement accuracy, resulting from an error budget-based methodology. Among these improvements is a stiffer focus stage design with digital servos, resulting in improved focus stability. Tighter climate controls and improved dose control reduce drift during mask patterning. As a result, global composite CD uniformity below 5 nm (3σ) has been demonstrated, with placement accuracy below 10 nm (3σ) across the mask. Self-calibration methods are used to optimize and monitor system performance, reducing the need to print test plates. The SLM calibration camera views programmed test patterns, making it possible to evaluate image metrics such as CD uniformity and line edge roughness. The camera is also used to characterize image placement over the optical field. A feature called ProcessEqualizer TM has been developed to correct long-range CD errors arising from process effects on production photomasks. Mask data is sized in real time to compensate for pattern-dependent errors related to local pattern density, as well as for systematic pattern-independent errors such as radial CD signatures. Corrections are made in the pixel domain in the advanced adjustments processor, which also performs global biasing, stamp distortion compensation, and corner enhancement. In the Sigma7500, the mask pattern is imaged with full edge addressability in each

  1. Process development for 257-nm photomask fabrication using environmentally stable chemically amplified photoresists

    NASA Astrophysics Data System (ADS)

    Albelo, Jeff A.; Rathsack, Benjamen M.; Pirogovsky, Peter Y.

    2001-01-01

    Consumer demand for faster computers, increased data storage space, and higher density memory arrays has driven development efforts in photomask production the way of the wafer fab. This drive has pushed mask fabrication toward smaller and more uniform features. It has thus inspired the creation of a deep ultraviolet, or DUV, (257 nm) optical pattern generator and an attendant resist process for mask fabrication. A DUV photoresist process based on precoated photomask blanks is presented herein with a demonstrably robust resist, both in terms of plate shelf life and latent image stability. Benchmark lithographic performance in resolution, depth of focus (DOF), linearity, and iso/dense bias are presented. In addition, the ambient atmospheric stability of the resist system is explored. Traditional maskmaking has, until now, excluded a post-exposure bake (PEB) step. Equipment requirements and resist critical dimension (CD) performance as a function of PEB are also presented. Photoresist process parameter space is defined and discussed herein. Precoated mask blank post-apply bake (PAB) stability is also examined as it relates to after-develop inspection (ADI) CDs. Dark erosion tests are employed to study photoresist contrast uniformity as it relates to ADI CDs. First-pass specifications for incoming raw materials are also proposed.

  2. New tools to enable photomask repair to the 32nm node

    NASA Astrophysics Data System (ADS)

    Robinson, Tod; White, Roy; Bozak, Ron; Roessler, Ken; Arruza, Bernie; Hogle, Dennis; Archuletta, Mike; Lee, David

    2009-10-01

    The AFM-technology based technique of nanomachining has been well-proven in the area photomask repair since its introduction a decade ago. However, the problems and challenges facing the mask repair operator have changed significantly in this period, and ongoing engineering platform development has reflected these shifts, as well as refinements based on specialized experience with nanomachining repair technology. Improvements from this technical development include improved monitoring and control of the internal tool environment (to minimize AFM scan noise and thermal drift), and automation to easily and reliably clean and characterize the 3-dimensional shape of the NanoBitTM apex. For repair applications, improvements will be shown for the automated and operator-intuitive reconstruction of 3-dimensional nanometer-scale patterns on the photomask with referenced z-depth and xy alignment regardless of pattern orthogonality. Multiple pattern repair capability is also reviewed due to a greater diversity of available process options and multi-repair box capability with a common quartz-level z-reference point. Finally, it will be shown how all of these individual improvements work together to provide extended repair capability down to the 32 nm technology node.

  3. Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks

    NASA Astrophysics Data System (ADS)

    Wood, Obert; Wong, Keith; Parks, Valentin; Kearney, Patrick; Meyer-Ilse, Julia; Luong, Vu; Philipsen, Vicky; Faheem, Mohammad; Liang, Yifan; Kumar, Ajay; Chen, Esther; Bennett, Corbin; Fu, Bianzhu; Gribelyuk, Michael; Zhao, Wayne; Mangat, Pawitter; Van der Heide, Paul

    2016-03-01

    Extreme ultraviolet (EUV) lithography with reflective photomasks continues to be a potential patterning technology for high volume manufacturing at the 7 nm technology node and beyond. EUV photomasks with alternative materials to the commonly used Mo/Si multilayer (ML) reflector and patterned Ta-based absorber (both of which are known to require shadow effect corrections and lead to large through-focus pattern placement errors) are being actively explored. Because the reflective bandwidth of a Ru/Si ML is significantly wider than the reflective bandwidth of a Mo/Si ML and the effective reflectance plane in Ru/Si is closer to the ML surface, Ru/Si ML coatings may be viable alternatives to the Mo/Si ML coatings that are commercially available today because they will lead to smaller mask 3D effects. In this paper, increases in the peak reflectivity and the reflective bandwidth of Ru/Si ML reflectors by using B4C interlayers to improve the Ru-Si interfaces are discussed. The conclusions of this paper are supported with the results of both experimental measurements and rigorous simulations.

  4. Viability of pattern shift for defect-free EUV photomasks at the 7nm node

    NASA Astrophysics Data System (ADS)

    Qi, Zhengqing John; Rankin, Jed; Narita, Eisuke; Kagawa, Masayuki

    2015-10-01

    Several challenges hinder EUV photomask fabrication and its readiness for high volume manufacturing (HVM). The lack in availability of pristine defect-free blanks as well as the absence of a robust mask repair technique mandates defect mitigation through pattern shift for the production of defect-free photomasks. By using known defect locations on a blank, the mask design can be intentionally shifted to avoid patterning directly over a defect. The work presented here provides a comprehensive look at pattern shift implementation to intersect EUV HVM for the 7 nm technology node. An empirical error budget to compensate for various measurement errors, based on the latest HVM inspection and write tool capabilities, is first established and then verified post-patterning. The validated error budget is applied to 20 representative EUV blanks and pattern shift is performed using OPC'd 7 nm node fully functional chip designs that were also recently used to fabricate working 7 nm node devices. Probability of defect-free masks are explored for various 7 nm mask levels, including metal, contact, and gate cut layers. From these results, an assessment is made on the current viability of defect-free EUV masks for the 7 nm node.

  5. Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond

    NASA Astrophysics Data System (ADS)

    Kushida, Yasuyuki; Handa, Hitoshi; Maruyama, Hiroshi; Abe, Yuuki; Fujimura, Yukihiro; Yokoyama, Toshifumi

    2007-10-01

    New process with hard-mask (HM) blanks was evaluated as one of candidates for photomasks beyond 45nm-node. Through the fabrication of gate-layer photomasks, aptitude of the HM process for practical use was confirmed from the view of controllability on CDs and defects. Although conventional process for attenuated PSM was shown to have critical CD error which belongs to the "patterns" in bright-field masks, experimental data proved effectiveness of the HM process to control CDs after process optimization. With the HM blanks, remarkable reduction of CD error more than 80% of conventional process was confirmed. In this report, peculiar opaque defects are also shown to be a critical issue on the HM process. From results of design of experiment (DOE), combining the proper means to prepare the HM blanks with the optimized HM etching condition, these defects were proved to be controlled within the tolerance for production. Through the investigations, validity of the HM process on practical use for mask fabrication of 45nm-node and beyond is considered as conclusions.

  6. Z-correction, a method for achieving ultraprecise self-calibration on large area coordinate measurement machines for photomasks

    NASA Astrophysics Data System (ADS)

    Ekberg, Peter; Stiblert, Lars; Mattsson, Lars

    2014-05-01

    High-quality photomasks are a prerequisite for the production of flat panel TVs, tablets and other kinds of high-resolution displays. During the past years, the resolution demand has become more and more accelerated, and today, the high-definition standard HD, 1920 × 1080 pixels2, is well established, and already the next-generation so-called ultra-high-definition UHD or 4K display is entering the market. Highly advanced mask writers are used to produce the photomasks needed for the production of such displays. The dimensional tolerance in X and Y on absolute pattern placement on these photomasks, with sizes of square meters, has been in the range of 200-300 nm (3σ), but is now on the way to be <150 nm (3σ). To verify these photomasks, 2D ultra-precision coordinate measurement machines are used with even tighter tolerance requirements. The metrology tool MMS15000 is today the world standard tool used for the verification of large area photomasks. This paper will present a method called Z-correction that has been developed for the purpose of improving the absolute X, Y placement accuracy of features on the photomask in the writing process. However, Z-correction is also a prerequisite for achieving X and Y uncertainty levels <90 nm (3σ) in the self-calibration process of the MMS15000 stage area of 1.4 × 1.5 m2. When talking of uncertainty specifications below 200 nm (3σ) of such a large area, the calibration object used, here an 8-16 mm thick quartz plate of size approximately a square meter, cannot be treated as a rigid body. The reason for this is that the absolute shape of the plate will be affected by gravity and will therefore not be the same at different places on the measurement machine stage when it is used in the self-calibration process. This mechanical deformation will stretch or compress the top surface (i.e. the image side) of the plate where the pattern resides, and therefore spatially deform the mask pattern in the X- and Y-directions. Errors due

  7. Reduction of image placement error on photomask-making for multiple patterning

    NASA Astrophysics Data System (ADS)

    Hiromatsu, Takahiro; Fukui, Toru; Tsukagoshi, Kenta; Ono, Kazunori; Hashimoto, Masahiro

    2014-03-01

    To make photomasks with high overlay accuracy, "Charge Dissipation Layer (CDL)" materials have been developed. Commercialized CDL materials can reduce electro-static charging on the surface of resist during electron beam exposure. However, some side effects are introduced to the mask-making process. The resolution performance of chemically amplified resist (CAR) is degraded owing to acid diffusion from the CDL components to the resist surface. A newly developed CDL solved this problem by controlling the acid diffusion. A positive-tone CAR with the CDL showed no resolution degradation, and performance was maintained for over 30 days after coating CDL and resist. Furthermore, the CDL has been evaluated on a negative-tone CAR which is more sensitive to CDL.

  8. Mask aligner lithography for TSV-structures using a double-sided (structured) photomask

    NASA Astrophysics Data System (ADS)

    Weichelt, T.; Stuerzebecher, L.; Zeitner, U. D.

    2015-03-01

    Through-silicon vias (TSV) are important for wafer level packaging (WLP) as they provide patterning holes through thick silicon dies to integrate and interconnect devices which are stacked in z-direction. For economic processing TSV fabrication primarily needs to be cost-effective including especially a high throughput. Furthermore, a lithography process for TSV has to be stable enough to allow patterning on pre-structured substrates with inhomogeneous topography. This can be addressed by an exposure process which offers a large depth of focus. We have developed a mask-aligner lithography process based on the use of a double-sided photomask to realize aerial images which meet these constraints.

  9. A simple method for producing freestanding 3D microstructures by integrated photomask micromolding

    NASA Astrophysics Data System (ADS)

    Li, Hui

    2015-12-01

    Freestanding three-dimensional (3D) microstructures are widely used in micro-electro-mechanical system (MEMS) applications or can function as microdevices themselves. However, microfabrication methods for freestanding 3D microstructures have limitations in shape, size, cost, and mass production, etc. In this work, integrated photomask micromolding is demonstrated, which uses a portable UV light source and chrome glass micromolding to fabricate 3D microstructures without alignment. Specifically, a chrome layer on one side of the glass micromold shields the excess filling SU-8 photoresist from UV exposure and only the SU-8 photoresist in mold cavities is crosslinked. The 3D microstructures produced using this method have very high dimensional accuracy and the profile error is approximately 1.5%. This method can be used with features of virtually any size and shape and can be integrated into highly-parallel micromolding processes and has potential for MEMS applications.

  10. Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays.

    PubMed

    Park, Woongkyu; Rhie, Jiyeah; Kim, Na Yeon; Hong, Seunghun; Kim, Dai-Sik

    2016-01-01

    Advances in photolithographic processes have allowed semiconductor industries to manufacture smaller and denser chips. As the feature size of integrated circuits becomes smaller, there has been a growing need for a photomask embedded with ever narrower patterns. However, it is challenging for electron beam lithography to obtain <10 nm linewidths with wafer scale uniformity and a necessary speed. Here, we introduce a photolithography-based, cost-effective mask fabrication method based on atomic layer deposition and overhang structures for sacrificial layers. Using this method, we obtained sub-10 nm square ring arrays of side length 50 μm, and periodicity 100 μm on chromium film, on 1 cm by 1 cm quartz substrate. These patterns were then used as a contact-lithography photomask using 365 nm I-line, to generate metal ring arrays on silicon substrate. PMID:27025277

  11. Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays

    NASA Astrophysics Data System (ADS)

    Park, Woongkyu; Rhie, Jiyeah; Kim, Na Yeon; Hong, Seunghun; Kim, Dai-Sik

    2016-03-01

    Advances in photolithographic processes have allowed semiconductor industries to manufacture smaller and denser chips. As the feature size of integrated circuits becomes smaller, there has been a growing need for a photomask embedded with ever narrower patterns. However, it is challenging for electron beam lithography to obtain <10 nm linewidths with wafer scale uniformity and a necessary speed. Here, we introduce a photolithography-based, cost-effective mask fabrication method based on atomic layer deposition and overhang structures for sacrificial layers. Using this method, we obtained sub-10 nm square ring arrays of side length 50 μm, and periodicity 100 μm on chromium film, on 1 cm by 1 cm quartz substrate. These patterns were then used as a contact-lithography photomask using 365 nm I-line, to generate metal ring arrays on silicon substrate.

  12. Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays

    PubMed Central

    Park, Woongkyu; Rhie, Jiyeah; Kim, Na Yeon; Hong, Seunghun; Kim, Dai-Sik

    2016-01-01

    Advances in photolithographic processes have allowed semiconductor industries to manufacture smaller and denser chips. As the feature size of integrated circuits becomes smaller, there has been a growing need for a photomask embedded with ever narrower patterns. However, it is challenging for electron beam lithography to obtain <10 nm linewidths with wafer scale uniformity and a necessary speed. Here, we introduce a photolithography-based, cost-effective mask fabrication method based on atomic layer deposition and overhang structures for sacrificial layers. Using this method, we obtained sub-10 nm square ring arrays of side length 50 μm, and periodicity 100 μm on chromium film, on 1 cm by 1 cm quartz substrate. These patterns were then used as a contact-lithography photomask using 365 nm I-line, to generate metal ring arrays on silicon substrate. PMID:27025277

  13. Analysis of the laser oxidation kinetics process of In-In(2)O(3) MTMO photomasks by laser direct writing.

    PubMed

    Xia, Feng; Zhang, Xinzheng; Wang, Meng; Liu, Qian; Xu, Jingjun

    2015-11-01

    One kind of novel grayscale photomask based on Metal-transparent-metallic-oxides (MTMOs) system fabricated by laser direct writing was demonstrated recently. Here, a multilayer oxidation model of In-In(2)O(3) film with a glass substrate was proposed to study the pulsed laser-induced oxidation mechanism. The distribution of the electromagnetic field in the film is calculated by the transfer matrix method. Temperature fields of the model are simulated based on the heat transfer equations with the Finite-Difference Time-Domain method. The oxidation kinetics process is studied based on the laser-induced Cabrera-Mott theory. The simulated oxidation processes are consistent with the experimental results, which mean that our laser-induced oxidation model can successfully interpret the fabrication mechanism of MTMO grayscale photomasks. PMID:26561189

  14. Optimization and scale-down of wafer-based resist strip and rinse processes for photomask production

    NASA Astrophysics Data System (ADS)

    Aggus, Brant L.; Weaver, Gene

    2002-03-01

    Retrofitting of wafer processing equipment is a common scenario in the photomask industry, as most available tools are built to accommodate the high throughput and substrate size of wafers. The acid process tanks in use at most mask shops are built to suit a single rack of 25 8 inch wafers, each coated with roughly two microns of photoresist. Conversely, a typical photomask shop sends one to two masks at a time through the resist strip line, each coated with 4500 angstroms of resist. The amount of unused volume of active chemical within an 8 inch X 8.5 inch X 10 inch acid tank when it is dumped is enough to warrant a hardware change. Experimentation has shown that it is possible to decrease Piranha usage by 43 percent by optimizing tank size for photomasks. The same logic applies to quick dump rinsers (QDRs). Additionally, water is wasted with 'spray down' processes, whereby masks are sprayed via perforated bars or nozzles. Because a < 0.5 μm viscous sublayer can not be practically achieved through spraying the mask, better cleaning performance is obtained with a bottom-filled weiring process. This is demonstrated through experimental results and theoretical mass transfer models.

  15. The art of photomask materials for low-k1-193nm lithography

    NASA Astrophysics Data System (ADS)

    Hashimoto, Masahiro; Iwashita, Hiroyuki; Mitsui, Hideaki

    2009-04-01

    The resolution of photomask patterns were improved with a hardmask (HM) system. The system which is thin Sicompounds layer is easily etched by the hyper-thin resist (below 100nm thickness). The HM material has sufficient etching selectivity against the chrome-compounds which is the second layer chrome absorber for the phase-shifter. This hardmask layer has been completely removed during the phase-shifter etching. It means that the conventional phase-shit mask (PSM) has been made with the ultimately high-resolution without configuration changes. Below 50nm resolution of PSM was made with 90nm thickness resist on HM layer in this paper. The CD bias between a resist feature CD and a chrome feature CD was almost zero (below 1nm) in the optimized etching condition. We confirmed that the mask performances were the equal to COMS (Cr-HM on MoSi binary mask) in resolution and CD linearity. The performances of hardmask blanks will be defined by resist performance because of almost zero bias.

  16. European MEDEA+ CRYSTAL project: DFM photomasks inputs for EDA workflow task force

    NASA Astrophysics Data System (ADS)

    Beisser, Eric; Tissier, Michel; Au, David; Bonniol, Stéphane; Garcia, Patrick; Morey-Chaisemartin, Philippe; Sadran, Dominique; Servin, Isabelle; Tabusse, Michel

    2009-04-01

    The cost of production of a photomask set has been soaring over the last few years, and now reaches 1 million to 2 million, almost 10% of the overall cost of a new project development. And new projects have seen their profitability lifetime reduced over time to 3 to 6 months. Any uncontrolled increase in cost or delay can make the difference between a profitable or non profitable project, and can even lead to the cancellation of the entire project. For the last few years, silicon manufacturability issues have been taken into account in the design process through a widespread use of Design For Manufacturing tools, but so far the impact of design on mask manufacturability has not been thoroughly studied. This article presents a novel Design For Mask Manufacturing approach, which defines a robust process encompassing design rules and constraints, validation procedures, exchange mechanisms between all actors in the flow (designers, mask shops, and foundry) in order to minimize the number and impact of mask design issues, to trace their root causes and severity, and automation of the handoff of design and administrative data to the mask shop. A demonstrator for the DFMM flow is being shown.

  17. Photomask-based integration process of low-defect suspended carbon nanotubes into SOI MEMS.

    PubMed

    Lee, Shih-Wei; Muoth, Matthias; Hierold, Christofer

    2014-05-30

    A fully-developed photomask-based integration process is reported. The process can integrate suspended carbon nanotubes (CNTs) into micro-structures on silicon-on-insulator chips. The process features batch-compatible fabrication and post-growth metallization of suspended CNTs, which has never been demonstrated by any other processes. The post-growth metallization avoids deterioration of the metals at the elevated CNT growth temperature and enables mechanically robust double-clamped configuration. Two key steps ensure a significant reduction of the risk for damage or contamination of the CNTs during post-growth processing. SiO2 bridges were fabricated to physically support CNTs during the wet processing, and a protective Al2O3 layer (∼40 nm) was deposited to prevent resist contamination during lithography. The combination of these two steps enables the removal of the unprotected suspended segments of unwanted CNTs by oxygen plasma ashing, improving device yield by a factor of six. The electrically interfaced suspended CNT device possessed high CNT quality (D/G(+) intensity ratio of 1/224 in Raman spectroscopy) and good electrical properties, such as low device resistances as low as 105 kΩ and reduced gate hysteresis as low as 65 mV in ambient air. Measurements of eights devices indicate that the release step did not have a systematic influence on the device resistances. PMID:24787500

  18. Extending analog design scaling to sub-wavelength lithography: co-optimization of RET and photomasks

    NASA Astrophysics Data System (ADS)

    Parikh, Ashesh; Dorris, Siew; Smelko, Tom; Walbrick, Walter; Mahalingam, Pushpa; Arch, John; Green, Kent; Garg, Vishal; Buck, Peter; West, Craig

    2011-04-01

    The mask requirements for 110nm half-node BiCMOS process were analyzed with the goal to meet customer needs at lower cost and shorter cycle times. The key differentiating features for this technology were high density CMOS libraries along with high-power Bipolar, LDMOS and DECMOS components. The high voltage components were characterized by transistors that formed cylindrical junctions. The presence of curved features in the data is particularly detrimental to the write time on a 50KeV vector mask writer. The mask write times have a direct impact on both mask cost and cycle time. Design rules also permit rectangular or stretched contacts to allow conductance of high currents. To meet customer needs but still manage the computational lithography overhead as well as the patterning process performance, this process was evaluated in terms of computational lithography and photomask co-optimization for the base-line 50KeV vector and laser mask-writers. Due to the differences in imaging and processing of the different mask writing systems, comparative analysis of critical dimension (CD) performance both in terms of linearity and pitch was done. Differences in imaging on silicon due to mask fidelity were also expected and characterized. The required changes in OPC necessary to switch to the new mask process were analyzed.

  19. Application of Mueller matrix spectroscopic ellipsometry to determine line edge roughness on photomasks

    NASA Astrophysics Data System (ADS)

    Heinrich, A.; Dirnstorfer, I.; Bischoff, J.; Richter, U.; Ketelson, H.; Meiner, K.; Mikolajick, T.

    2013-10-01

    We report on Mueller Matrix spectroscopic ellipsometry (MM-SE) to examine undesired asymmetries in structural parameters, i.e. line edge roughness (LER). The investigation was done on a photomask containing line space arrays with intentionally modulated line edges. The Mueller Matrix (MM) elements were measured within the complete azimuth angle range (0 - 360°) and a wavelength range from 300 nm to 980 nm. The results are presented in polar coordinates with the azimuth angle and wavelength as the angular and radial coordinate, respectively. It was found that LER significantly impacts the MM elements, which is indicated by the increase of the isotropic character of the array. The experimental data are confirmed by Rigorous Coupled Wave Analysis (RCWA) simulations on perturbed arrays. Based on RCWA the impact of LER amplitudes in the nm range is determined. It was found that both deviation of critical dimension (CD) and LER amplitude impact the MM elements. Based on the intensity ratios of the elements and their spectral distribution both errors create a characteristic finger print, which allows to separate them. Finally, the required measurement precision for LER in the nm range is estimated at 0.001. This precision is challenging but achievable with today's metrology.

  20. Improved estimates of the range of errors on photomasks using measured values of skewness and kurtosis

    NASA Astrophysics Data System (ADS)

    Hamaker, Henry Chris

    1995-12-01

    Statistical process control (SPC) techniques often use six times the standard deviation sigma to estimate the range of errors within a process. Two assumptions are inherent in this choice of metric for the range: (1) the normal distribution adequately describes the errors, and (2) the fraction of errors falling within plus or minus 3 sigma, about 99.73%, is sufficiently large that we may consider the fraction occurring outside this range to be negligible. In state-of-the-art photomasks, however, the assumption of normality frequently breaks down, and consequently plus or minus 3 sigma is not a good estimate of the range of errors. In this study, we show that improved estimates for the effective maximum error Em, which is defined as the value for which 99.73% of all errors fall within plus or minus Em of the mean mu, may be obtained by quantifying the deviation from normality of the error distributions using the skewness and kurtosis of the error sampling. Data are presented indicating that in laser reticle- writing tools, Em less than or equal to 3 sigma. We also extend this technique for estimating the range of errors to specifications that are usually described by mu plus 3 sigma. The implications for SPC are examined.

  1. Accuracy issues in the finite difference time domain simulation of photomask scattering

    NASA Astrophysics Data System (ADS)

    Pistor, Thomas V.

    2001-09-01

    As the use of electromagnetic simulation in lithography increases, accuracy issues are uncovered and must be addressed. A proper understanding of these issues can allow the lithographer to avoid pitfalls in electromagnetic simulation and to know what can and can not be accurately simulated. This paper addresses the important accuracy issues related to the simulation of photomask scattering using the Finite Difference Time Domain (FDTD) method. Errors related to discretization and periodic boundary conditions are discussed. Discretization-related issues arise when derivatives are replaced by finite differences and when integrals are replaced by summations. These approximations can lead to mask features that do not have exact dimensions. The effects of discretization error on phase wells and thin films are shown. The reflectivity of certain thin film layers is seen to be very sensitive to the layer thickness. Simulation experiments and theory are used to determine how fine a discretization is necessary and various discretization schemes that help minimize error are presented. Boundary-condition-related errors arise from the use of periodic boundary conditions when simulating isolated mask features. The effects of periodic boundary conditions are assessed through the use of simulation experiments. All errors are associated with an ever-present trade-off between accuracy and computational resources. However, choosing the cell size wisely can, in many cases, minimize error without significantly increasing computation resource requirements.

  2. Tokyo, Japan

    NASA Technical Reports Server (NTRS)

    1981-01-01

    Tokyo, (35.5N, 140.0E) the capital city of Japan, Tokyo Bay and the neighboring cities of Yokohama, Kawasaki and Chiba are seen in this view of Japan. This great international seaport facility covers almost all of the bayfront and is home to over thirty million people.

  3. Advances in post AFM repair cleaning of photomask with CO2 cryogenic aerosol technology

    NASA Astrophysics Data System (ADS)

    Bowers, Charles; Varghese, Ivin; Balooch, Mehdi; Brandt, Werner

    2009-04-01

    As the mask technology matures, critical printing features and sub-resolution assist features (SRAF) shrink below 100 nm, forcing critical cleaning processes to face significant challenges. These challenges include use of new materials, oxidation, chemical contamination sensitivity, proportionally decreasing printable defect size, and a requirement for a damage-free clean. CO2 cryogenic aerosol cleaning has the potential to offer a wide process window for meeting these new challenges, if residue adder issues and damage can be eliminated. Some key differentiations of CO2 cryogenic aerosol cleaning are the non-oxidizing and non-etching properties compared to conventional chemical wet clean processes with or without megasonics. In prior work, the feasibility of CO2 cryogenic aerosol in post AFM repair photomask cleaning was demonstrated. In this paper, recent advancements of CO2 cryogenic aerosol cleaning technology are presented, focusing on the traditional problem areas of particle adders, electrostatic discharge (ESD), and mask damage mitigation. Key aspects of successful CO2 cryogenic aerosol cleaning include the spray nozzle design, CO2 liquid purity, and system design. The design of the nozzle directly controls the size, density, and velocity of the CO2 snow particles. Methodology and measurements of the solid CO2 particle size and velocity distributions will be presented, and their responses to various control parameters will be discussed. Adder control can be achieved only through use of highly purified CO2 and careful materials selection. Recent advances in CO2 purity will be discussed and data shown. The mask cleaning efficiency by CO2 cryogenic aerosol and damage control is essentially an optimization of the momentum of the solid CO2 particles and elimination of adders. The previous damage threshold of 150 nm SRAF structures has been reduced to 70nm and data will be shown indicating 60 nm is possible in the near future. Data on CO2 tribocharge mitigation

  4. Large-scale analytical Fourier transform of photomask layouts using graphics processing units

    NASA Astrophysics Data System (ADS)

    Sakamoto, Julia A.

    2015-10-01

    Compensation of lens-heating effects during the exposure scan in an optical lithographic system requires knowledge of the heating profile in the pupil of the projection lens. A necessary component in the accurate estimation of this profile is the total integrated distribution of light, relying on the squared modulus of the Fourier transform (FT) of the photomask layout for individual process layers. Requiring a layout representation in pixelated image format, the most common approach is to compute the FT numerically via the fast Fourier transform (FFT). However, the file size for a standard 26- mm×33-mm mask with 5-nm pixels is an overwhelming 137 TB in single precision; the data importing process alone, prior to FFT computation, can render this method highly impractical. A more feasible solution is to handle layout data in a highly compact format with vertex locations of mask features (polygons), which correspond to elements in an integrated circuit, as well as pattern symmetries and repetitions (e.g., GDSII format). Provided the polygons can decompose into shapes for which analytical FT expressions are possible, the analytical approach dramatically reduces computation time and alleviates the burden of importing extensive mask data. Algorithms have been developed for importing and interpreting hierarchical layout data and computing the analytical FT on a graphics processing unit (GPU) for rapid parallel processing, not assuming incoherent imaging. Testing was performed on the active layer of a 392- μm×297-μm virtual chip test structure with 43 substructures distributed over six hierarchical levels. The factor of improvement in the analytical versus numerical approach for importing layout data, performing CPU-GPU memory transfers, and executing the FT on a single NVIDIA Tesla K20X GPU was 1.6×104, 4.9×103, and 3.8×103, respectively. Various ideas for algorithm enhancements will be discussed.

  5. Laser-induced oxidation of Zn and Zn alloy films for direct-write grayscale photomasks

    NASA Astrophysics Data System (ADS)

    Wang, Jun; Chang, Marian; Tu, Yuqiang; Poon, David K.; Chapman, Glenn H.; Choo, Chinheng; Peng, Jun

    2006-02-01

    Previous research showed that bimetallic Bi/In and Sn/In films exhibit good grayscale levels after laser exposure due to controlled film oxidation. While giving a large alteration in optical density (OD) from 3.0OD to 0.22OD at 365 nm, Bi/In and Sn/In films show a very nonlinear OD change with laser power, making fine control of grayscale writing difficult at some gray levels. This paper studies Zn and Zn alloy films as possible candidates for improved direct-write grayscale photomask applications. Zn and Zn alloys laser oxidation have been reported previously, but without grayscale optical measurements and applications. In this paper Zn films (50 nm ~ 240 nm), Sn/Zn (100 nm), Al/Zn (100 nm), Bi/Zn (100 nm) and In/Zn (100 nm) were DC- and RF-sputtered onto glass slides and then were scanned by argon ion CW laser (488 nm). Among these films, the highest OD change, 3OD (from 3.2OD before exposure to 0.2OD after laser exposure) at 365 nm, was found in the In/Zn (25/75 nm or 84at% Zn) film. The characterization of grayscale level to laser power modulation in Zn and Zn alloy films with various thickness or composition ratios were investigated. The Zn OD change versus laser power curve is more linear than those of Sn/In and Bi/In films. In/Zn films have better characterization of grayscale level versus laser writing power than pure Zn film. Among these four Zn alloy films, Zn/Al shows most linear relation of OD at 365 nm to laser power modulation.

  6. Japan Smoke

    Atmospheric Science Data Center

    2013-04-16

    article title:  Smoke Plume from Industrial Fires in Miyagi Prefecture, Japan     ... 2011, and its subsequent tsunami, several oil refineries and industrial complexes caught fire, including facilities in the Port of Sendai ...

  7. Okinawa, Japan

    NASA Technical Reports Server (NTRS)

    1991-01-01

    The southern half of the island of Okinawa, Japan (26.5N, 128.0E) can be seen in this nearly cloud free view. Okinawa is part of the Ryuku Islands which extend from Taiwan northeastward to Kyushu, southernmost of the Japanese Home Islands. The large military base at Kadena, with large runways, is visible near the center of the scene. Kadena is one of several emergency landing sites around the world for the space shuttle.

  8. Hokkaido, Japan

    NASA Technical Reports Server (NTRS)

    2006-01-01

    Cities mingle with rugged hills and a dormant volcano in this image of Hokkaido, Japan. This three-dimensional image comes from observations made by the Advanced Spaceborne Thermal Emission and Reflection Radiometer (ASTER) on NASA's Terra satellite on July 23, 2006. The view is toward the north and slightly east. Green indicates vegetation; beige and gray indicate bare ground, paved surfaces, or buildings; and dark blue indicates water. The water body at the top of the image is the Pacific Ocean. Now dormant, Mount Yotei is a stratovolcano--a symmetrical cone composed of alternating layers of hardened lava, solidified ash, and volcanic rocks ejected in previous eruptions. It reaches a height of 1,898 meters (6,227 feet), and its summit sports a 700-meter- (2,297-foot-) wide crater. Snow often caps this volcano, but in this summertime shot, the volcano's summit is snow-free. The volcano is also known as Ezo-Fuji for its resemblance to Mount Fuji. As angular patches of gray and beige indicate, urban areas surround the volcano, most notably the city of Kutchan to the northwest. Even when volcanoes remain active, people often settle close to them, drawn by benefits of good soil and mild climates that appear to outweigh the risks. NASA image by Jesse Allen, using data provided courtesy of the NASA/GSFC/MITI/ERSDAC/JAROS, and U.S./Japan ASTER Science Team.

  9. Inductively coupled plasma etch of DUV MoSi photomasks: a designed study of etch chemistries and process results

    NASA Astrophysics Data System (ADS)

    Constantine, Chris; Johnson, David J.; Westerman, Russell J.; Hourd, Andrew C.

    1998-12-01

    The continuing requirements for high resolution, critical dimension control and linearity on photomasks necessitates highly anisotropic and uniform etching of the absorber material. Plasma etching has seen strong increases in popularity to improve the above mentioned requirements. Also recently popular is the inclusion of Embedded Phase Shift materials such as Molybdenum Silicide (MoSi); these materials allow for an engineered 180 degree shift in the phase of the exposure light at the wafer pane, affording enhanced contrast at the edges of a line or feature. This article studies the effect of ICP-based plasma conditions on the CD Uniformity, MoSi etch rate and post-etch Quartz roughness of 6 X 6 DUV MoSi Embedded Phase Shift mask structures through use of carefully Designed Experiments. This Design of Experiment (DOE) makes it possible to screen plasma chemistry, optimize resultant plasma parameters and present an overlayed Simultaneous Solution which is used as a centerpoint for Device Plate etch tuning. The high plasma density, independent ion energy control and low pressure operation of Inductively Coupled Plasmas make this technology well suited to minimizing undercut of the MoSi and affords a vehicle for the realization of a zero-basis etch process.

  10. Development of paper-based microfluidic analytical device for iron assay using photomask printed with 3D printer for fabrication of hydrophilic and hydrophobic zones on paper by photolithography.

    PubMed

    Asano, Hitoshi; Shiraishi, Yukihide

    2015-07-01

    This paper describes a paper-based microfluidic analytical device for iron assay using a photomask printed with a 3D printer for fabrication of hydrophilic and hydrophobic zones on the paper by photolithography. Several designed photomasks for patterning paper-based microfluidic analytical devices can be printed with a 3D printer easily, rapidly and inexpensively. A chromatography paper was impregnated with the octadecyltrichlorosilane n-hexane solution and hydrophobized. After the hydrophobic zone of the paper was exposed to the UV light through the photomask, the hydrophilic zone was generated. The smallest functional hydrophilic channel and hydrophobic barrier were ca. 500 μm and ca. 100 μm in width, respectively. The fabrication method has high stability, resolution and precision for hydrophilic channel and hydrophobic barrier. This test paper was applied to the analysis of iron in water samples using a colorimetry with phenanthroline. PMID:26088776

  11. Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing

    NASA Astrophysics Data System (ADS)

    Kim, Sook-Kyeong; Kim, Byung-Gook; Moon, Seong-Yong; Choi, Sung-Woon; Han, Woo-Sung

    2005-06-01

    CAR(Chemically amplified resist) is widely used in 50keV VSB (Variable Shaped Beam) e-beam process in photomask manufacturing due to its advantage of high sensitivity which gives to reduced writing time compared to non-CAR. The 10kV raster e-beam system, however, is spread out already worldwide and plays a important role till now in middle grade mask-making. Conventionally the non-CAR like ZEP7000 has been applied to the 10kV raster e-beam system and it gives good performance for raster scan e-beam system. In mass production, sometimes, maintaining two kinds of resist simultaneously of CAR and non-CAR are inefficient strategy to the mask house which has limited resources. This situation makes the authors to apply CAR to the 10kV raster e-beam process. Generally, the grid of 10kV raster e-beam(MEBES) is large and limited compared to the current VSB grid. Historically, many layout data is designed already based on the large limited grid and this gives to limited sizing value. Moreover, it is difficult to control exposure dose in raster e-beam system and control bias with develop time in CAR process. These situations make more difficult CAR application to raster e-beam system under the simple mask data preparation strategy. In this paper, some critical problems will be discussed in isofocal process making for raster scan e-beam system. Advantage and disadvantage will be also discussed through the comparison of basic parameters such as dose margin, develop margin, and the fogging effect between the CAR and non-CAR process in 10kV raster e-beam process.

  12. A novel mask proximity correction software combining accuracy and reduced writing time for the manufacturing of advanced photomasks

    NASA Astrophysics Data System (ADS)

    Schiavone, Patrick; Martin, Luc; Browning, Clyde; Farys, Vincent; Sundermann, Frank; Narukawa, Shogo; Takikawa, Tadahiko; Hayashi, Naoya

    2012-06-01

    The new generations of photomasks are seen to bring more and more challenges to the mask manufacturer. Maskshops face two conflicting requirements, namely improving pattern fidelity and reducing or at least maintaining acceptable writing time. These requirements are getting more and more challenging since pattern size continuously shrinks and data volumes continuously grows. Although the classical dose modulation Proximity Effect Correction is able to provide sufficient process control to the mainstream products, an increased number of published and wafer data show that the mask process is becoming a nonnegligible contributor to the 28nm technology yield. We will show in this paper that a novel approach of mask proximity effect correction is able to meet the dual challenge of the new generation of masks. Unlike the classical approach, the technique presented in this paper is based on a concurrent optimization of the dose and geometry of the fractured shots. Adding one more parameter allows providing the best possible compromise between accuracy and writing time since energy latitude can be taken into account as well. This solution is implemented in the Inscale software package from Aselta Nanographics. We have assessed the capability of this technology on several levels of a 28nm technology. On this set, the writing time has been reduced up to 25% without sacrificing the accuracy which at the same time has been improved significantly compared to the existing process. The experiments presented in the paper confirm that a versatile proximity effect correction strategy, combining dose and geometry modulation helps the users to tradeoff between resolution/accuracy and e-beam write time.

  13. Optimized lithography process for through-silicon vias-fabrication using a double-sided (structured) photomask for mask aligner lithography

    NASA Astrophysics Data System (ADS)

    Weichelt, Tina; Stuerzebecher, Lorenz; Zeitner, Uwe D.

    2015-07-01

    Through-silicon vias (TSV) are very important for wafer-level packaging as they provide patterning holes through thick silicon dies to integrate and interconnect devices which are stacked in the z-direction. For economic processing, TSV fabrication primarily needs to be cost effective, especially for a high throughput. Furthermore, a lithography process for TSV has to be stable enough to allow patterning on prestructured substrates with inhomogeneous topography. This can be addressed by an exposure process which offers a large depth of focus. We have developed a mask-aligner lithography process based on the use of a double-sided photomask to realize aerial images that meet these constraints.

  14. Academic Libraries in Japan

    ERIC Educational Resources Information Center

    Cullen, Rowena; Nagata, Haruki

    2008-01-01

    Academic libraries in Japan are well resourced by international standards, and support Japan's internationally recognized research capability well, but there are also ways in which they reflect Japan's strong bureaucratic culture. Recent changes to the status of national university libraries have seen a new interest in customer service, and…

  15. Characterization of a non-chemically amplified resist for photomask fabrication using a 257-nm optical pattern generator

    NASA Astrophysics Data System (ADS)

    Rathsack, Benjamen M.; Tabery, Cyrus E.; Stachowiak, Timothy B.; Dallas, Tim E.; Xu, Cheng-Bai; Pochkowski, Mike; Willson, C. Grant

    1999-12-01

    I-line optical pattern generators using non-chemically amplified resists have become the workhorses for high throughput mask fabrication. The demand for smaller and more uniform features on photomasks has driven the development of a 257 nm optical pattern generator. A non-chemically amplified resist is being developed to maximize the performance of this new 257 nm mask tool. Resist characterization and lithography simulation are being used to formulate a non-chemically amplified resist for 257 nm optical pattern generators. Non- chemically amplified resists are advantageous for us in mask fabrication due to their storage and post-exposure stability. Chemically amplified resists may provide higher performance but they also require environmental mini-environments and a post-exposure bake equipment not commonly present in mask houses. Diazonaphthoquinone (DNQ)/novolak resists have not been used for DUV Integrated Circuit (IC) applications mainly due to the low sensitivity and the strong absorbance of the DNQ photoactive compound (PAC) at 248 nm. However, a 2,1,4 DNQ based resist has been characterized that bleaches at 257 nm and inhibits novolak. The photoproduct of the 2,1,4 DNQ PAC is much more transparent at 257 nm than 248 nm. Novolak resin is too strongly absorbing for use in formulating efficient 248 nm resists, but novolak has an absorbance minimum at 257 nm that provides transparency similar to poly (hydroxystyrene). Lithography simulation is being used to develop a non- chemically amplified resist to minimize the expensive iteration of manufacturing trials. An exposure system using a 257 nm frequency double Ar laser system has been constructed to study the resist photokinetics. Dill exposure parameters (A, B and C) have been extracted for a 2,1,4 DNQ/novolak based resist. Dissolution rate measurements have been made with a DRM developed at the University of Texas at Austin. Simulation is used to determine the optimal resist absorption, bleaching, dose and

  16. Fast simulation methods for non-planar phase and multilayer defects in DUV and EUV photomasks for lithography

    NASA Astrophysics Data System (ADS)

    Lam, Michael Christopher

    This dissertation develops rapid modeling methodologies for the printability and inspectability of various types of defects on photomasks in DUV and EUV lithography. Several fast and approximate methods for defect simulation are introduced and validated by comparing their results with Finite Difference Time Domain (FDTD) calculations of scattering from the same geometry. The common strategy is to decompose the electromagnetic (EM) scattering into individual signal contributions by analyzing rigorous simulations, and then to develop efficient alternative models for each contribution. Two methods are introduced to calculate the observed scattering from DUV phase defects. First, the through focus behavior of an isolated defect can be used to extract two defect parameters, size and phase, which fully characterize the defect by means of an EM equivalent thin mask model. Post and void defects can also be differentiated based on the side of defocus that their peak signal occurs. Second, a defect projector methodology is introduced that allows results for an isolated defect and a defect-free pattern to be combined to predict their interaction for any defect location. The defect projector is four orders of magnitude faster than 3D FDTD simulation, and can correctly predict the defect induced dimension change to within 30% for worst case. The main emphasis of this dissertation is on scattering from non-planar multilayer structures to understand the printability of buried defects inside of EUV mask blanks. A new method based on ray tracing is developed by exploiting the small non-specular forward angular scattering of individual bilayers, which is 10X smaller than the back scatter, and its approximation as zero allows a new and tractable mathematical factoring. The method is tested for various deposition strategies, defect sizes, defect shapes, as well as various illumination angles of incidence and polarization. Smoothing of the defect shape during deposition is confirmed to

  17. Photomasks for FPD

    NASA Astrophysics Data System (ADS)

    Kanaya, Yasuhiro; Iizuka, Tetsuya; Tomooka, Takatoshi

    2015-07-01

    Continuous innovation of mobile devices such as smart phones provides new and better experiences for users. Such innovations demand for FPD (Flat Panel Display) to have higher resolution, a smarter design, a lighter weight, lower energy consumption, and many other improvements. Among those requirements, higher resolution is the most critical feature to achieve realistic images on the screen and to provide different user experiences. However, higher resolution LCD (Liquid Crystal Display) panels cannot be easily achieved simply by scaling and shrinking the process rule as has been historically done in the semiconductor industry. This is because an LCD panel is an optical device as well as being an electrically controlled integrated circuit. The important factors in fabricating an LCD panel as an optical device are discussed here in conjunction with the photo mask requirements.

  18. Electrical Characteristics of Low-Temperature Polycrystalline Silicon Complementary Metal-Oxide-Semiconductor Thin-Film Transistors with Six-Step Photomask Structure

    NASA Astrophysics Data System (ADS)

    Lee, Sang-Jin; Park, Jae-Hoon; Oh, Kum-Mi; Lee, Seok-Woo; Lee, Kyung-Eon; Shin, Woo-Sup; Jun, Myung-chul; Yang, Yong-Suk; Hwang, Yong-Kee

    2011-06-01

    We propose two types of six-step photomask, complementary metal-oxide-semiconductor (CMOS), thin-film transistor (TFT) PCT device structures in order to simplify their fabrication process compared with that of conventional, low-temperature, polycrystalline silicon (LTPS) CMOS TFT devices. The initial charge transfer characteristics of both types of six-step PCT are equivalent to those of the conventional nine-step PCT. Both types of six-step PCT are comparable to the conventional nine-step mask lightly doped drain (LDD) device in terms of the dc device lifetime of over 10 years at Vds=5 V for line inversion driving, which is the normally recognized duration time for semiconducting devices.

  19. Contact photolithography using a carbon-black embedded soft photomask and ultraviolet light emitting diodes with application on patterned sapphire substrates.

    PubMed

    Hsieh, Heng; Wu, Chun-Ying; Lee, Yung-Chun

    2016-04-18

    This paper presents a contact photolithography method for large-area ultraviolet (UV) patterning using a soft polydimethylsiloxane (PDMS) photomask and a planar light source consisting of arrayed light-emitting diodes (LEDs). With simple design and construction, the UV light source can achieve uniformly distributed UV light intensity over an area of 4" in diameter but its divergent angle is 15°. To overcome this large divergent angle, a PDMS soft mold embedded with carbon-black inserts as the UV light blocking materials is applied. It is demonstrated that, when increasing the aspect ratio of the carbon-black inserts, one can achieve excellent UV patterning results. Both experimental data and simulation results are presented. This contact photolithography system has been successfully used for manufacturing patterned sapphire substrates (PSSs) in LED industry. The advantages and potential applications of the proposed method will be addresses. PMID:27137297

  20. TWELVE DOORS TO JAPAN.

    ERIC Educational Resources Information Center

    BEARDSLEY, RICHARD K.; HALL, JOHN WHITNEY

    THE TWELVE DOORS OF THIS COLLEGE-LEVEL TEXT ARE TWELVE CHAPTERS ON ASPECTS OF JAPAN AND JAPANESE CULTURE AS TREATED BY VARIOUS ACADEMIC DISCIPLINES. THE AUTHORS' PURPOSE IN CHOOSING THIS FORMAT WAS TO PRESENT INTRODUCTORY INFORMATION ABOUT JAPAN AND TO ACQUAINT STUDENTS WITH THE AIMS, MATERIALS, AND METHODS OF DISCIPLINES OTHER THAN THE ONE THEY…

  1. Teaching English in Japan.

    ERIC Educational Resources Information Center

    Kitao, Kenji, Ed.; And Others

    English language instruction, which is considered very important in Japan, is offered in 90 percent of all secondary schools and is studied by almost all students, even though it is an elective subject. English is considered a cultural and commercial link with the western world and has been taught in Japan since the mid-nineteenth century. Most…

  2. Journey to Japan

    ERIC Educational Resources Information Center

    Godfrey, Lorraine

    1978-01-01

    Create a variety of activities related to the country you are studying--Japan, for example--and arrange them by such subjects as art, games, creative writing, maps, dress and greetings. These activities can be tied in with classroom learning centers or stations. Here students make passports, learn about traditional styles of dress in Japan, learn…

  3. Island of Okinawa, Japan

    NASA Technical Reports Server (NTRS)

    1982-01-01

    The island of Okinawa, (26.5N, 128.0E) largest of the Ryukyu Islands, Japan. The Ryukyu island group lies south of the main home islands of Japan in an arc towards the Chinese island Republic of Taiwan. As is typical throughout the Japanese home islands, intense urban development can be observed all over the island in this near vertical view.

  4. Rehabilitation in Japan, 1988.

    ERIC Educational Resources Information Center

    Japanese Society for Rehabilitation of the Disabled, Tokyo.

    The scope of Japan's rehabilitation services for persons with disabilities is reviewed and discussed from the perspective of social and demographic change in that country. An introductory chapter on the current situation in Japan looks at characteristics of the land, the people, the government, industry and the economy, and the culture. The second…

  5. Groundwater contamination in Japan

    NASA Astrophysics Data System (ADS)

    Tase, Norio

    1992-07-01

    Problems on groundwater contamination in Japan are briefly summarized in this paper. Although normal physical conditions in Japan restrict the possibilities of groundwater contamination, human activities are threatening groundwater resources. A survey by the Environment Agency of Japan showed nationwide spreading of organic substances, such as trichloroethylene as well as nitrogen compounds. Synthetic detergents have also been detected even in rural areas and in deep confined aquifers, although their concentrations are not as high. Public awareness of agrichemical or pesticides abuse, especially from golf courses, is apparent. Other problems such as nitrate-nitrogen, leachate from landfills, and the leaking of underground storage tanks are also discussed.

  6. GPM Arrives in Japan

    NASA Video Gallery

    An international satellite that will set a new standard for global precipitation measurements from space has completed a 7,300-mile journey from the United States to Japan, where it now will underg...

  7. Space communications in Japan

    NASA Astrophysics Data System (ADS)

    Mori, T.

    This paper outlines some of the planned satellite comunication projects in Japan over the next 5-7 years. In addition, Japanese space development policies are set out along with a historic review of the development of artificial satellites.

  8. Space robotics in Japan

    NASA Technical Reports Server (NTRS)

    Whittaker, William; Lowrie, James W.; Mccain, Harry; Bejczy, Antal; Sheridan, Tom; Kanade, Takeo; Allen, Peter

    1994-01-01

    Japan has been one of the most successful countries in the world in the realm of terrestrial robot applications. The panel found that Japan has in place a broad base of robotics research and development, ranging from components to working systems for manufacturing, construction, and human service industries. From this base, Japan looks to the use of robotics in space applications and has funded work in space robotics since the mid-1980's. The Japanese are focusing on a clear image of what they hope to achieve through three objectives for the 1990's: developing long-reach manipulation for tending experiments on Space Station Freedom, capturing satellites using a free-flying manipulator, and surveying part of the moon with a mobile robot. This focus and a sound robotics infrastructure is enabling the young Japanese space program to develop relevant systems for extraterrestrial robotics applications.

  9. Occupational asthma in Japan.

    PubMed

    Dobashi, Kunio

    2012-07-01

    Research into occupational asthma (OA) in Japan has been led by the Japanese Society of Occupational and Environmental Allergy. The first report about allergic OA identified konjac asthma. After that, many kinds of OA have been reported. Cases of some types of OA, such as konjac asthma and sea squirt asthma, have been dramatically reduced by the efforts of medical personnel. Recently, with the development of new technologies, chemical antigen-induced asthma has increased in Japan. Due to advances in anti-asthma medication, control by medical treatment tends to be emphasized and the search for causative antigens seems to be neglected. Furthermore, we do not have a Japanese guideline for diagnosis and management of OA. This article discusses the current state of OA in Japan. PMID:22872819

  10. Space robotics in Japan

    NASA Astrophysics Data System (ADS)

    Whittaker, William; Lowrie, James W.; McCain, Harry; Bejczy, Antal; Sheridan, Tom; Kanade, Takeo; Allen, Peter

    1994-03-01

    Japan has been one of the most successful countries in the world in the realm of terrestrial robot applications. The panel found that Japan has in place a broad base of robotics research and development, ranging from components to working systems for manufacturing, construction, and human service industries. From this base, Japan looks to the use of robotics in space applications and has funded work in space robotics since the mid-1980's. The Japanese are focusing on a clear image of what they hope to achieve through three objectives for the 1990's: developing long-reach manipulation for tending experiments on Space Station Freedom, capturing satellites using a free-flying manipulator, and surveying part of the moon with a mobile robot. This focus and a sound robotics infrastructure is enabling the young Japanese space program to develop relevant systems for extraterrestrial robotics applications.

  11. Cultural Astronomy in Japan

    NASA Astrophysics Data System (ADS)

    Renshaw, Steven L.

    While Japan is known more for its contributions to modern astronomy than its archaeoastronomical sites, there is still much about the culture's heritage that is of interest in the study of cultural astronomy. This case study provides an overview of historical considerations necessary to understand the place of astronomy in Japanese society as well as methodological considerations that highlight traditional approaches that have at times been a barrier to interdisciplinary research. Some specific areas of study in the cultural astronomy of Japan are discussed including examples of contemporary research based on interdisciplinary approaches. Japan provides a fascinating background for scholars who are willing to go beyond their curiosity for sites of alignment and approach the culture with a desire to place astronomical iconography in social context.

  12. Dutch surgery in Japan.

    PubMed

    van Gulik, Thomas M; Nimura, Yuji

    2005-01-01

    An isolation policy was adopted in feudal Japan from 1639 to 1853 owing to the fear of foreign influence. During those 200 years of isolation, all foreigners were withheld from the country with the exception of the Dutch, who were permitted to establish a trading post on a small island in the Bay of Nagasaki, called Decima. Western culture and science reached the Japanese exclusively through the Dutch on Decima. Health care on Decima was provided by Dutch barber-surgeons, who introduced Western surgical practice in Japan. Official interpreters were the only Japanese allowed on Decima. It was from among these interpreters that the first Japanese surgeons arose who, having mastered the Dutch language, translated several Dutch anatomic and surgical texts. Genpaku Sugita translated a Dutch anatomy textbook into Japanese, which was completed in 1774. This book, entitled Kaitai Shinsho [New Book on Anatomy], was the first Western scientific monograph to be translated entirely into Japanese. Several Dutch surgical schools were founded through which Dutch surgery, known in Japan as "surgery of the red-haired" was propagated. According to the custom of the surgical guilds in Holland, certificates were granted to Japanese apprentices who had completed their training in Dutch surgery. About 60 Dutch surgeons had served on Decima up to 1850, providing the basis for surgery to develop in Japan. Among them, Philipp Franz von Siebold was an exceptional scholar who also had a great impact in making Japanese culture known to the Western world. PMID:15599736

  13. Political Corruption in Japan.

    ERIC Educational Resources Information Center

    Reed, Steven R.; And Others

    1996-01-01

    Provides an overview of political corruption and its place in Japanese culture and society. Discusses recent scandals and efforts at political reform. These efforts are moving Japan from a "boss-patronage" system to a "civic-culture." Includes a table of post-war Japanese prime ministers and corruption scandals. (MJP)

  14. [Films: China and Japan].

    ERIC Educational Resources Information Center

    Gumport, Roberta H.

    The history of filmmaking in China and Japan and film usage in teaching are considered in this document. Pointing out how films describe historical context and culture, the document also describes various techniques of film making. Films in China were heavily influenced by western models and have tended to be tools of the power structure, as…

  15. Photovoltaics in Japan

    NASA Technical Reports Server (NTRS)

    Shimada, K.

    1985-01-01

    Report surveys status of research and development on photovoltaics in Japan. Report based on literature searches, private communications, and visits by author to Japanese facilities. Included in survey are Sunshine Project, national program to develop energy sources; industrial development at private firms; and work at academic institutions.

  16. Japan's electronic packaging technologies

    NASA Astrophysics Data System (ADS)

    Tummala, Rao R.; Pecht, Michael

    1995-02-01

    The JTEC panel found Japan to have significant leadership over the United States in the strategic area of electronic packaging. Many technologies and products once considered the 'heart and soul' of U.S. industry have been lost over the past decades to Japan and other Asian countries. The loss of consumer electronics technologies and products is the most notable of these losses, because electronics is the United States' largest employment sector and is critical for growth businesses in consumer products, computers, automobiles, aerospace, and telecommunications. In the past there was a distinction between consumer and industrial product technologies. While Japan concentrated on the consumer market, the United States dominated the industrial sector. No such distinction is anticipated in the future; the consumer-oriented technologies Japan has dominated are expected to characterize both domains. The future of U.S. competitiveness will, therefore, depend on the ability of the United States to rebuild its technological capabilities in the area of portable electronic packaging.

  17. "Hands on" Japan.

    ERIC Educational Resources Information Center

    Borries, Richard

    Cultural learning kits designed by Evansville, Indiana teachers, supervisors, and community advisory groups were compiled to provide information about Japan to community organizations and students. This document provides a key to the contents of the kits. The kits contain teaching materials and information about food, school materials, language…

  18. Advanced composites in Japan

    NASA Technical Reports Server (NTRS)

    Diefendorf, R. Judd; Hillig, William G.; Grisaffe, Salvatore J.; Pipes, R. Byron; Perepezko, John H.; Sheehan, James E.

    1994-01-01

    The JTEC Panel on Advanced Composites surveyed the status and future directions of Japanese high-performance ceramic and carbon fibers and their composites in metal, intermetallic, ceramic, and carbon matrices. Because of a strong carbon and fiber industry, Japan is the leader in carbon fiber technology. Japan has initiated an oxidation-resistant carbon/carbon composite program. With its outstanding technical base in carbon technology, Japan should be able to match present technology in the U.S. and introduce lower-cost manufacturing methods. However, the panel did not see any innovative approaches to oxidation protection. Ceramic and especially intermetallic matrix composites were not yet receiving much attention at the time of the panel's visit. There was a high level of monolithic ceramic research and development activity. High temperature monolithic intermetallic research was just starting, but notable products in titanium aluminides had already appeared. Matrixless ceramic composites was one novel approach noted. Technologies for high temperature composites fabrication existed, but large numbers of panels or parts had not been produced. The Japanese have selected aerospace as an important future industry. Because materials are an enabling technology for a strong aerospace industry, Japan initiated an ambitious long-term program to develop high temperature composites. Although just starting, its progress should be closely monitored in the U.S.

  19. Japan's electronic packaging technologies

    NASA Technical Reports Server (NTRS)

    Tummala, Rao R.; Pecht, Michael

    1995-01-01

    The JTEC panel found Japan to have significant leadership over the United States in the strategic area of electronic packaging. Many technologies and products once considered the 'heart and soul' of U.S. industry have been lost over the past decades to Japan and other Asian countries. The loss of consumer electronics technologies and products is the most notable of these losses, because electronics is the United States' largest employment sector and is critical for growth businesses in consumer products, computers, automobiles, aerospace, and telecommunications. In the past there was a distinction between consumer and industrial product technologies. While Japan concentrated on the consumer market, the United States dominated the industrial sector. No such distinction is anticipated in the future; the consumer-oriented technologies Japan has dominated are expected to characterize both domains. The future of U.S. competitiveness will, therefore, depend on the ability of the United States to rebuild its technological capabilities in the area of portable electronic packaging.

  20. Japan: Tsunami Flooding

    Atmospheric Science Data Center

    2013-04-16

    ... of 41 kilometers (25 miles) by 89 kilometers (55 miles). Flooding extending about 2 kilometers (1.2 miles) inland is visible just north ... March 18, 2005 and March 19, 2011 - Before and after tsunami flooding along Japan's eastern coast. project:  MISR ...

  1. Language Testing in Japan.

    ERIC Educational Resources Information Center

    Brown, James Dean, Ed.; Yamashita, Sayoko Okada, Ed.

    Papers on second language testing in Japan include: "Differences Between Norm-Referenced and Criterion-Referenced Tests" (James Dean Brown); "Criterion-Referenced Test Construction and Evaluation" (Dale T. Griffe); "Behavioral Learning Objectives as an Evaluation Tool" (Judith A. Johnson); "Developing Norm- Referenced Tests for Program-Level…

  2. Nuclear Power in Japan.

    ERIC Educational Resources Information Center

    Powell, John W.

    1983-01-01

    Energy consumption in Japan has grown at a faster rate than in any other major industrial country. To maintain continued prosperity, the government has embarked on a crash program for nuclear power. Current progress and issues/reactions to the plan are discussed. (JN)

  3. Country Profiles. Japan.

    ERIC Educational Resources Information Center

    Muramatsu, Minoru

    This occasional paper on Japan is one of a series setting forth the nature, scope, and accomplishments of population activities in specified countries. Here, an overview is given of population characteristics and growth patterns, the relationship of population growth to socioeconomic development, and the history of population concerns and…

  4. Lifelong Learning Facilities in Japan.

    ERIC Educational Resources Information Center

    Hirai, Akishige

    1997-01-01

    Examines Japan's educational system and the role of national policy and local government in fostering lifelong learning. Reasons why Japan is building a lifelong learning society are examined, as are the opportunities available in Japan for learning beyond traditional education, the national and local government's role, access to facilities,…

  5. Globalization and Education in Japan

    ERIC Educational Resources Information Center

    Ohkura, Kentaro; Shibata, Masako

    2009-01-01

    In this paper, the authors contend that globalization in Japan is the gradual process in which Japan's positioning of "self" within international relations, which had formerly been dominated by the West, has changed. Accordingly, Japan's relationships with the West and the rest of the world, for example, Asia, have also been reviewed and modified.…

  6. Improving the CD linearity and proximity performance of photomasks written on the Sigma7500-II DUV laser writer through embedded OPC

    NASA Astrophysics Data System (ADS)

    Österberg, Anders; Ivansen, Lars; Beyerl, Angela; Newman, Tom; Bowhill, Amanda; Sahouria, Emile; Schulze, Steffen

    2007-10-01

    Optical proximity correction (OPC) is widely used in wafer lithography to produce a printed image that best matches the design intent while optimizing CD control. OPC software applies corrections to the mask pattern data, but in general it does not compensate for the mask writer and mask process characteristics. The Sigma7500-II deep-UV laser mask writer projects the image of a programmable spatial light modulator (SLM) using partially coherent optics similar to wafer steppers, and the optical proximity effects of the mask writer are in principle correctable with established OPC methods. To enhance mask patterning, an embedded OPC function, LinearityEqualize TM, has been developed for the Sigma7500- II that is transparent to the user and which does not degrade mask throughput. It employs a Calibre TM rule-based OPC engine from Mentor Graphics, selected for the computational speed necessary for mask run-time execution. A multinode cluster computer applies optimized table-based CD corrections to polygonized pattern data that is then fractured into an internal writer format for subsequent data processing. This embedded proximity correction flattens the linearity behavior for all linewidths and pitches, which targets to improve the CD uniformity on production photomasks. Printing results show that the CD linearity is reduced to below 5 nm for linewidths down to 200 nm, both for clear and dark and for isolated and dense features, and that sub-resolution assist features (SRAF) are reliably printed down to 120 nm. This reduction of proximity effects for main mask features and the extension of the practical resolution for SRAFs expands the application space of DUV laser mask writing.

  7. Scientific ballooning in Japan

    NASA Astrophysics Data System (ADS)

    Makino, Fumiyoshi

    Activities in scientific ballooning in Japan during 1998-1999 are reported. The total number of scientific balloons flown in Japan in 1998 and 1999 was sixteen, eight flights in each year. The scientific objectives were observations of high energy cosmic electrons, air samplings at various altitudes, monitoring of atmospheric ozone density, Galactic infrared observations, and test flights of new type balloons. Balloon expeditions were conducted in Antarctica by the National Institute of Polar Research, in Russia, in Canada and in India in collaboration with foreign countries' institutes to investigate cosmic rays, Galactic infrared radiation, and Earth's atmosphere. There were three flights in Antarctica, four flights in Russia, three flights in Canada and two flights in India. Four test balloons were flown for balloon technology, which included pumpkin-type super-pressure balloon and a balloon made with ultra-thin polyethylene film of 3.4 μm thickness.

  8. [Gambling disorder in Japan].

    PubMed

    Tanabe, Hitoshi

    2015-09-01

    Gambling disorder is a psychiatric disorder characterized by persistent and recurrent problematic gambling behavior, associated with impaired functioning, reduced quality of life, and frequent divorce and bankruptcy. Gambling disorder is reclassified in the category Substance-Related and Addictive Disorders in the DSM-5 because its clinical features closely resemble those of substance use disorders, and gambling activates the reward system in brain in much the same way drugs do. Prevalence of gambling disorder in Japan is high rate because of slot machines and pachinko game are very popular in Japan. The author recommend group psychotherapy and self-help group (Gamblers Anonymous), because group dynamics make them accept their wrongdoings related to gambling and believe that they can enjoy their lives without gambling. PMID:26394523

  9. Sapporo, Hokkaido, Japan

    NASA Technical Reports Server (NTRS)

    1992-01-01

    The city of Sapporo on the northernmost of the Japanese Home Island of Hokkaido (43.5N, 141.5E), host to the 1986 Winter Olympic Games is situated along the margin of a large valley which extends across the island from the Sea of Japan to the Pacific Ocean. The Valley is largely cultivated (the lighter green of the cultivated land distinguishes it from the gray urban development of Sapporo), but much of the island remains heavily forested.

  10. Psychology in Japan.

    PubMed

    Imada, Hiroshi; Tanaka-Matsumi, Junko

    2016-06-01

    The purpose of this article is to provide information about Japan and its psychology in advance of the 31st International Congress of Psychology (ICP), to be held in Yokohama, Japan, in 2016. The article begins with the introduction of the Japanese Psychological Association (JPA), the hosting organization of the ICP 2016, and the Japanese Union of Psychological Associations consisting of 51 associations/societies, of which the JPA is a member. This is followed by a brief description of a history of psychology of Japan, with emphasis on the variation in our approach to psychology in three different periods, that is, the pre- and post-Pacific War periods, and the post-1960 period. Next, the international contributions of Japanese psychology/psychologists are discussed from the point of view of their visibility. Education and training in psychology in Japanese universities is discussed with a final positive remark about the long-awaited enactment of the Accredited Psychologist Law in September, 2015. PMID:26892102

  11. Astrogeodetic geoid of Japan

    NASA Technical Reports Server (NTRS)

    Ganeko, Y.

    1976-01-01

    Three kinds of astrogeodetic geoid maps for Japan are presented: one referred to the global (18, 18) geoid of the 1973 Smithsonian Standard Earth (III) (SE III), referred to the best-fitting ellipsoid of SE III, and one referred to the reference ellipsoid of the Tokyo datum. Interpolations of the deflection of the vertical are carried out by a least squares estimation method. The geoid height differences obtained are compared with solutions of satellite-derived station positions. Good agreement is found in a comparison with Doppler tracking stations.

  12. Ijime in Japan.

    PubMed

    Ogura, Masayoshi; Okada, Kaori; Hamada, Shoko; Asaga, Reiko; Honjo, Shuji

    2012-01-01

    This paper reviews the problem of ijime in Japan from a variety of perspectives, primarily through studies conducted in this country. The term ijime is not uniform in concept, open to different interpretations given the disparity in definitions among different circles, making precise assessment of the actual conditions difficult. Such being the case, what is needed is further study on the mechanisms and actual state of ijime accounting for the flow of the times, and compilation of research to enable the creation of ever more effective modes of prevention and intervention. PMID:22909914

  13. Legalized abortion in Japan.

    PubMed

    Hart, T M

    1967-10-01

    The enactment of the Eugenic Protection Act in Japan was followed by many changes. The population explosion was stemmed, the birth rate was halved, and while the marriage rate remained steady the divorce rate declined. The annual total of abortions increased until 1955 and then slowly declined. The highest incidence of abortions in families is in the 30 to 34 age group when there are four children in the family. As elsewhere abortion in advanced stages of pregnancy is associated with high morbidity and mortality. There is little consensus as to the number of criminal abortions. Reasons for criminal abortions can be found in the legal restrictions concerning abortion: Licensing of the abortionist, certification of hospitals, taxation of operations and the requirement that abortion be reported. Other factors are price competition and the patient's desire for secrecy. Contraception is relatively ineffective as a birth control method in Japan. Oral contraceptives are not yet government approved. In 1958 alone 1.1 per cent of married women were sterilized and the incidence of sterilization was increasing. PMID:6062283

  14. Legalized Abortion in Japan

    PubMed Central

    Hart, Thomas M.

    1967-01-01

    The enactment of the Eugenic Protection Act in Japan was followed by many changes. The population explosion was stemmed, the birth rate was halved, and while the marriage rate remained steady the divorce rate declined. The annual total of abortions increased until 1955 and then slowly declined. The highest incidence of abortions in families is in the 30 to 34 age group when there are four children in the family. As elsewhere abortion in advanced stages of pregnancy is associated with high morbidity and mortality. There is little consensus as to the number of criminal abortions. Reasons for criminal abortions can be found in the legal restrictions concerning abortion: Licensing of the abortionist, certification of hospitals, taxation of operations and the requirement that abortion be reported. Other factors are price competition and the patient's desire for secrecy. Contraception is relatively ineffective as a birth control method in Japan. Oral contraceptives are not yet government approved. In 1958 alone 1.1 per cent of married women were sterilized and the incidence of sterilization was increasing. PMID:6062283

  15. China and Japan (Theme Issue).

    ERIC Educational Resources Information Center

    Kiernan, Henry, Ed.; Pyne, John, Ed.

    1993-01-01

    This serial issue is devoted to the theme "China and Japan" and contains six articles that focus on educational, political, and cultural issues in the two Asian countries. In the first article, "China and Japan: A New Era in Relations with the United States," Henry Kiernan and John Pyne provide a brief overview of the history of United States'…

  16. Japan to increase coal imports

    SciTech Connect

    Griffin, S.

    1982-04-01

    Imports of coal into Japan are expected to increase next year. One major company is buying into a Canadian mine to obtain a long-term supply contract, and other companies are expected to follow. A feasibility study on production of methanol-coal slurry and its transportation by pipeline in Alberta, Canada (conducted by Japan and Canada) has been completed.

  17. Teaching Elementary Students about Japan

    ERIC Educational Resources Information Center

    Fitzhugh, William P.

    This paper presents a study unit on Japan for elementary students which can be adapted for any level. Lessons include: (1) "Video Traveling Activities To Accompany Students on Their Journey to Japan"; (2) "Travel Brochure"; (3) "Discovering Culture by Using a Realia Kit"; (4) "Comparative Geography Using the Five Fundamental Themes of Geography";…

  18. Higher Education Studies in Japan

    ERIC Educational Resources Information Center

    Kaneko, Motohisa

    2010-01-01

    The rapid development of higher education in the postwar period has given rise to various problems, and higher education studies in Japan have developed in response to them. What have been the major issues, and how did academic research respond to them, in postwar Japan? This article delineates an outline of higher education studies in general,…

  19. Generic antibiotics in Japan.

    PubMed

    Fujimura, Shigeru; Watanabe, Akira

    2012-08-01

    Generic drugs have been used extensively in many developed countries, although their use in Japan has been limited. Generic drugs reduce drug expenses and thereby national medical expenditure. Because generic drugs provide advantages for both public administration and consumers, it is expected that they will be more widely used in the future. However, the diffusion rate of generic drugs in Japan is quite low compared with that of other developed countries. An investigation on generic drugs conducted by the Ministry of Health, Labour and Welfare in Japan revealed that 17.2 % of doctors and 37.2 % of patients had not used generic drugs. The major reasons for this low use rate included distrust of off-patent products and lower drug price margin compared with the brand name drug. The generic drugs available in the market include external drugs such as wet packs, antihypertensive agents, analgesics, anticancer drugs, and antibiotics. Among them, antibiotics are frequently used in cases of acute infectious diseases. When the treatment of these infections is delayed, the infection might be aggravated rapidly. The pharmacokinetics-pharmacodynamics (PK-PD) theory has been adopted in recent chemotherapy, and in many cases, the most appropriate dosage and administration of antibiotics are determined for individual patients considering renal function; high-dosage antibiotics are used preferably for a short duration. Therefore, a highly detailed antimicrobial agent is necessary. However, some of the generic antibiotics have less antibacterial potency or solubility than the brand name products. We showed that the potency of the generic products of vancomycin and teicoplanin is lower than that of the branded drugs by 14.6 % and 17.3 %, respectively. Furthermore, we confirmed that a generic meropenem drug for injection required about 82 s to solubilize in saline, whereas the brand product required only about 21 s. It was thought that the cause may be the difference in size of bulk

  20. [Buddhist mummies in Japan].

    PubMed

    Morimoto, I

    1993-08-01

    The mummy of priest Kochi (preserved at Saishoji Temple, Teradomari, Niigata Pref.) has become famous, since it appeared in the book "Snow Country Tales" written by Bokushi Suzuki in 1841 (Fig. 1). In a country of high humidity, such as Japan, the belief that mummification could not, and did not, exist would not be altogether unfounded, but rather more a matter of common sense. There are two dozen Buddhist mummies in this country. It was not known until 1961 that a reliable source of artificial mummification has existed in Japan. The Japanese Buddhist mummies, apart from those of the Fujiwara family, a powerful clan of northeast Japan in the 12th century, dated mostly from the 17th to the 19th century as given in Table 1. Three principal types of mummification described by Vreeland, Jr. and Cockburn (1980) could be identified in the Japanese Buddhist mummies: type I, natural mummification; type II, intentional natural; and type III, artificial. Matsumoto (1990) classified the mummies into four groups, based on their ideological backgrounds: group A, mummies of the priests having faith in the Amitabha (the Supreme Buddha presiding over the Pure Land in the West); group B, sokushin-butsu mummies of the priests belonging to the Shingon sect of Japanese Buddhism founded by Kukai (Kobo-daishi); group C, nyujo mummies of the priests having faith in the Maitreya (the Buddha presiding over the Pure Land in the North, or the Buddha of the future); and group D, other mummies. These mummies of groups A, B, C and D are respectively listed in Table 2. Previous papers have shown that the mummies of the groups A, C and D belonged to the mummification of type I (natural mummification) or type II (intentional natural), whereas those of only the group B were of type III (artificial). The mummies of groups A to D were given as follows. a) Mummies of group A. The four mummies of the Fujiwara family in the Amitabha faith (preserved at Chusonji Temple, Hiraizumi, Iwate Pref.), which

  1. 21 CFR 186.1555 - Japan wax.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 3 2014-04-01 2014-04-01 false Japan wax. 186.1555 Section 186.1555 Food and....1555 Japan wax. (a) Japan wax (CAS Reg. No. 8001-39-6), also known as Japan tallow or sumac wax, is a..., India, and Japan). Japan wax is soluble in hot alcohol, benzene, and naphtha, and insoluble in water...

  2. Final inspection of photomask blanks

    NASA Astrophysics Data System (ADS)

    Schubert, Fredi; Sauerbrei, Hartmut; Aschke, Lutz; Knapp, Konrad

    2001-04-01

    In order to increase the quality in manufacturing of future photon mask generations Schott Lithotec is brought in a brand new, much increased automatic laser inspection system into a new manufacturing line of photo mask blanks. It is in a position to detect additionally to the standard defect types further defect types like dim- and bright-chrome defects. The resolution of the system is less than 100 nm. With a quickly inspecting time per blank of less than three minutes and for the first time in the world used automatic SMIF-pod-handling this is a tool for the 100 percent final inspection in the manufacturing of photo mask blanks.

  3. Materials Data on Ba(CuSe)2 (SG:139) by Materials Project

    SciTech Connect

    Kristin Persson

    2014-11-02

    Computed materials data using density functional theory calculations. These calculations determine the electronic structure of bulk materials by solving approximations to the Schrodinger equation. For more information, see https://materialsproject.org/docs/calculations

  4. Materials Data on Ba(CuSe)2 (SG:62) by Materials Project

    SciTech Connect

    Kristin Persson

    2014-07-09

    Computed materials data using density functional theory calculations. These calculations determine the electronic structure of bulk materials by solving approximations to the Schrodinger equation. For more information, see https://materialsproject.org/docs/calculations

  5. The Social Sciences in Japan

    ERIC Educational Resources Information Center

    Watanuki, Joji

    1975-01-01

    This article relates a brief historical background of social sciences in Japan, the institutional framework of social science education and research, and major issues and perspectives for the development of the social scinces. (ND)

  6. Helicobacter pylori infection in Japan

    PubMed Central

    Shiota, Seiji; Murakawi, Kazunari; Suzuki, Rumiko; Fujioka, Toshio; Yamaoka, Yoshio

    2013-01-01

    The prevalence of Helicobacter pylori infection is gradually decreasing in Japan. On the main island of Japan, nearly all H. pylori isolates possess cagA and vacA with strong virulence. However, less virulent H. pylori strains are frequently found in Okinawa where cases of gastric cancer are the lowest in Japan. Eradication therapy for peptic ulcer, idiopathic thrombocytopenic purpura, gastric mucosa-associated lymphoid tissue lymphoma and early gastric cancer after endoscopic resection has been approved by the Japanese national health insurance system. However, the Japanese Society for Helicobacter Research recently stated that all ‘H. pylori infection’ was considered as the indication for eradication irrespective of the background diseases. To eliminate H. pylori in Japan, the Japanese health insurance system should approve the eradication of all H. pylori infections. PMID:23265147

  7. Japan launches mission to Venus

    NASA Astrophysics Data System (ADS)

    Banks, Michael

    2010-06-01

    The Japanese space agency JAXA has launched its first mission to Venus. The Akatsuki craft, which means "dawn" in Japanese, took off last month from the Tanegashima Space Center on the island of Kagoshima, south-west of mainland Japan.

  8. Japan's launch vehicles

    NASA Astrophysics Data System (ADS)

    Kuroda, Y.; Hara, N.

    The development of Japan's Mu series scientific research launch vehicles, and N and H series practical applications vehicles, is described. The three-stage M-3C features a second-stage radio inertial guidance system. The evolution to the M-3S includes a first-stage TVC and Solid Motor Roll Control device, and eight 310-m strap-on boosters (SOB's). The M-3SII developed to launch an interplanetary satellite for the 1986 Halley's Comet apparition, employs two 735-mm SOB's and a microprocessor digitalized flight control system, and can put a 770 kg satellite into low earth orbit. The N-1 is a three-stage radio-guided vehicle using first and second stage liquid engines, a solid motor third stage, three SOB's, and having the capability to launch a 145 kg geostationary satellite. N-II improvements include a 350 kg geostationary payload capacity, nine SOB's, and an inertial guidance system. The H-1 planned for 1987 has a 550 kg geostationary payload capacity and a domestically developed cryogenic engine. The H-II planned for 1992 will be capable of launching a two-ton geostationary satellite, or LOX/LH2 plural satellites simultaneously. It will be powered by a single 95-ton thrust LE-7 main engine.

  9. Whistleblowing in Japan.

    PubMed

    Davis, Anne J; Konishi, Emiko

    2007-03-01

    This article, written from research data, focuses on the possible meaning of the data rather than on detailed statistical reporting. It defines whistleblowing as an act of the international nursing ethical ideal of advocacy, and places it in the larger context of professional responsibility. The experiences, actions, and ethical positions of 24 Japanese nurses regarding whistleblowing or reporting a colleague for wrongdoing provide the data. Of these respondents, similar in age, educational level and clinical experience, 10 had previously reported another nurse and 12 had reported a physician for a wrongful act. These data raise questions about overt actions to expose a colleague in a culture that values group loyalty and saving face. Additional research is needed for an in-depth understanding of whistleblowing, patient advocacy and professional responsibility across cultures, especially those that value group loyalty, saving face and similar concepts to the Japanese Ishin Denshin, where the value is on implicit understanding requiring indirect communication. Usually, being direct and openly discussing sensitive topics is not valued in Japan because such behavior disrupts the most fundamental value, harmony (wa). PMID:17425148

  10. Fusion Studies in Japan

    NASA Astrophysics Data System (ADS)

    Ogawa, Yuichi

    2016-05-01

    A new strategic energy plan decided by the Japanese Cabinet in 2014 strongly supports the steady promotion of nuclear fusion development activities, including the ITER project and the Broader Approach activities from the long-term viewpoint. Atomic Energy Commission (AEC) in Japan formulated the Third Phase Basic Program so as to promote an experimental fusion reactor project. In 2005 AEC has reviewed this Program, and discussed on selection and concentration among many projects of fusion reactor development. In addition to the promotion of ITER project, advanced tokamak research by JT-60SA, helical plasma experiment by LHD, FIREX project in laser fusion research and fusion engineering by IFMIF were highly prioritized. Although the basic concept is quite different between tokamak, helical and laser fusion researches, there exist a lot of common features such as plasma physics on 3-D magnetic geometry, high power heat load on plasma facing component and so on. Therefore, a synergetic scenario on fusion reactor development among various plasma confinement concepts would be important.

  11. High definition systems in Japan

    NASA Technical Reports Server (NTRS)

    Elkus, Richard J., Jr.; Cohen, Robert B.; Dayton, Birney D.; Messerschmitt, David G.; Schreiber, William F.; Tannas, Lawrence E., Jr.; Shelton, Duane

    1991-01-01

    The successful implementation of a strategy to produce high-definition systems within the Japanese economy will favorably affect the fundamental competitiveness of Japan relative to the rest of the world. The development of an infrastructure necessary to support high-definition products and systems in that country involves major commitments of engineering resources, plants and equipment, educational programs and funding. The results of these efforts appear to affect virtually every aspect of the Japanese industrial complex. The results of assessments of the current progress of Japan toward the development of high-definition products and systems are presented. The assessments are based on the findings of a panel of U.S. experts made up of individuals from U.S. academia and industry, and derived from a study of the Japanese literature combined with visits to the primary relevant industrial laboratories and development agencies in Japan. Specific coverage includes an evaluation of progress in R&D for high-definition television (HDTV) displays that are evolving in Japan; high-definition standards and equipment development; Japanese intentions for the use of HDTV; economic evaluation of Japan's public policy initiatives in support of high-definition systems; management analysis of Japan's strategy of leverage with respect to high-definition products and systems.

  12. High definition systems in Japan

    NASA Astrophysics Data System (ADS)

    Elkus, Richard J., Jr.; Cohen, Robert B.; Dayton, Birney D.; Messerschmitt, David G.; Schreiber, William F.; Tannas, Lawrence E., Jr.; Shelton, Duane

    1991-02-01

    The successful implementation of a strategy to produce high-definition systems within the Japanese economy will favorably affect the fundamental competitiveness of Japan relative to the rest of the world. The development of an infrastructure necessary to support high-definition products and systems in that country involves major commitments of engineering resources, plants and equipment, educational programs and funding. The results of these efforts appear to affect virtually every aspect of the Japanese industrial complex. The results of assessments of the current progress of Japan toward the development of high-definition products and systems are presented. The assessments are based on the findings of a panel of U.S. experts made up of individuals from U.S. academia and industry, and derived from a study of the Japanese literature combined with visits to the primary relevant industrial laboratories and development agencies in Japan. Specific coverage includes an evaluation of progress in R&D for high-definition television (HDTV) displays that are evolving in Japan; high-definition standards and equipment development; Japanese intentions for the use of HDTV; economic evaluation of Japan's public policy initiatives in support of high-definition systems; management analysis of Japan's strategy of leverage with respect to high-definition products and systems.

  13. 21 CFR 186.1555 - Japan wax.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 3 2010-04-01 2009-04-01 true Japan wax. 186.1555 Section 186.1555 Food and Drugs... Substances Affirmed as GRAS § 186.1555 Japan wax. (a) Japan wax (CAS Reg. No. 8001-39-6), also known as Japan... fruits of the oriental sumac, Rhus succedanea (Japan, Taiwan, and Indo-China), R. vernicifera...

  14. Mt. Fuji, Japan

    NASA Technical Reports Server (NTRS)

    2001-01-01

    [figure removed for brevity, see original site] Click on image to view the movie

    The nearly perfectly conical profile of Fuji soars 3,776 meters (12,388 feet) above sea level on southern Honshu, near Tokyo. The highest mountain in Japan, Fuji is the country's most familiar symbol. The summit of this graceful, dormant volcano is broken by a crater 610 meters (2,000 feet) in diameter. The crater is ringed by eight jagged peaks. The five Fuji Lakes lie on the northern slopes of the mountain, all formed in the wake of lava flows. Mirrored in the still waters of Kawaguchi-ko, the most beautiful of the five lakes, is a reflection of Fuji. Part of Fuji-Hakone-Izu National Park, Fuji last erupted for a two-month period starting in November 1707, covering Tokyo, some 100 kilometers (60 miles) away, with a layer of ash. According to legend, Fuji arose from the plain during a single night in 286 BC. Geologically, the mountain is much older than this.

    Considered sacred by many, Fuji is surrounded by temples and shrines. Thousands of pilgrims climb the mountain each year as part of their religious practice, hoping to reach the summit by dawn to watch the sunrise. This animated fly-by was created by draping visible and near infrared image data over a digital topography model, created from ASTER's stereo bands. The spatial resolution of both the image and topography is 15 m. The image is centered at 35.3 degrees north latitude, 138.7 degrees east longitude.

    The U.S. science team is located at NASA's Jet Propulsion Laboratory, Pasadena, Calif. The Terra mission is part of NASA's Science Mission Directorate.

  15. Quo Vadis, Japan. [Status of Japan's Nuclear Power Program

    SciTech Connect

    Not Available

    1993-08-01

    A pile of plutonium - 1.4 tonnes in all - was on board Japanese nuclear transport ship Akatsuki Maru when it left France on November 8, 1992 for Japan. Alongside it were Greenpeace's hostile and ever-vigilant boats and the great swells of public protest from around the world. Transports like this are likely to follow. But more to the tune of 30 to 40 tonnes of plutonium cargo is expected from the Japanese spent fuel that is separated at European reprocessing plants. Both Japanese utilities and governmental agencies have agreed that plutonium is to be fabricated into mixed oxide fuel (MOX) before being returned to Japan. But in the meantime, critics are accusing Japan of being one of the greatest threats to international safety. After the Akatsuki Maru spectacle, the Japanese civil nuclear program is awash in criticism and can not escape the watchful eye of the international community. Now, with Japan's parliamentary elections over and a review of its nuclear program just around the corner, the question is: Quo vadis, Japan

  16. Psychotropic dose equivalence in Japan.

    PubMed

    Inada, Toshiya; Inagaki, Ataru

    2015-08-01

    Psychotropic dose equivalence is an important concept when estimating the approximate psychotropic doses patients receive, and deciding on the approximate titration dose when switching from one psychotropic agent to another. It is also useful from a research viewpoint when defining and extracting specific subgroups of subjects. Unification of various agents into a single standard agent facilitates easier analytical comparisons. On the basis of differences in psychopharmacological prescription features, those of available psychotropic agents and their approved doses, and racial differences between Japan and other countries, psychotropic dose equivalency tables designed specifically for Japanese patients have been widely used in Japan since 1998. Here we introduce dose equivalency tables for: (i) antipsychotics; (ii) antiparkinsonian agents; (iii) antidepressants; and (iv) anxiolytics, sedatives and hypnotics available in Japan. Equivalent doses for the therapeutic effects of individual psychotropic compounds were determined principally on the basis of randomized controlled trials conducted in Japan and consensus among dose equivalency tables reported previously by psychopharmacological experts. As these tables are intended to merely suggest approximate standard values, physicians should use them with discretion. Updated information of psychotropic dose equivalence in Japan is available at http://www.jsprs.org/en/equivalence.tables/. [Correction added on 8 July 2015, after first online publication: A link to the updated information has been added.]. PMID:25601291

  17. FBIS report. Science and technology: Japan, April 10, 1996

    SciTech Connect

    1996-04-10

    ;Partial Contents: Biotechnology (Japan: Japan`s RITE Introduces Biotech Projects, Japan: Pharmacia Biotech Develops Detection Method for Point Mutation); Energy (Japan: New Catalyst for Synthesis Gas Reduces Energy Needs, Japan: Major Company Activities for Promotion of Wind Power Generation, Japan: Waste Power Generation System in Saitama Draws Much Attention); Environment (Japan: AIST`s NIMC To Develop Efficient Decomposition Method for Waste Using Super-Critial Water, Japan: Kyoei Co. Develops High Temperature Fusion Furnace for Industrial Waste Treatment, Japan: Air Dry Cleaning for Recycling Chemically Contaminated Plastic Sheets); Microelectronics (Japan: Toshiba Corp. DEC To jointly Develop LSI for ATM); Science and Technology Policy (Japan`s MITI To Begin Electronic Commerce Experiment Project); Technology Transfer (Japan: Nissho Iwai Delivers Cleaner Plant to Russia`s Energiya, Japan: Energy Agency Transfers Coal Fired Power Generation Technology to Indonesia); Telecommunications (Japan`s MPT Releases Study Report on Advanced Information Technologies).

  18. Unzen Volcano, Japan

    NASA Technical Reports Server (NTRS)

    1995-01-01

    This is a space radar image of the area around the Unzen volcano, on the west coast of Kyushu Island in southwestern Japan. Unzen, which appears in this image as a large triangular peak with a white flank near the center of the peninsula, has been continuously active since a series of powerful eruptions began in 1991. The image was acquired by the Spaceborne Imaging Radar-C/X-band Synthetic Aperture Radar (SIR-C/X-SAR) aboard the space shuttle Endeavour on its 93rd orbit on April 15, 1994. The image shows an area 41.5 kilometers by 32.8 kilometers (25.7 miles by 20.3 miles) that is centered at 32.75 degrees north latitude and 130.15 degrees east longitude. North is toward the upper left of the image. The radar illumination is from the top of the image. The colors in this image were obtained using the following radar channels: red represents the L-band (vertically transmitted and received); green represents the average of L-band and C-band (vertically transmitted and received); blue represents the C-band (vertically transmitted and received). Unzen is one of 15 'Decade' volcanoes identified by the scientific community as posing significant potential threats to large local populations. The city of Shimabara sits along the coast at the foot of Unzen on its east and northeast sides. At the summit of Unzen a dome of thick lava has been growing continuously since 1991. Collapses of the sides of this dome have generated deadly avalanches of hot gas and rock known as pyroclastic flows. Volcanologists can use radar image data to monitor the growth of lava domes, to better understand and predict potentially hazardous collapses.

    Spaceborne Imaging Radar-C and X-Synthetic Aperture Radar (SIR-C/X-SAR) is part of NASA's Mission to Planet Earth. The radars illuminate Earth with microwaves allowing detailed observations at any time, regardless of weather or sunlight conditions. SIR-C/X-SAR uses three microwave wavelengths: L-band (24 cm), C-band (6 cm) and X-band (3 cm). The

  19. The educational system in Japan

    NASA Technical Reports Server (NTRS)

    Spearman, M. L.

    1986-01-01

    The rapid economic growth of Japan since World War II has resulted in Japan becoming a reference point for developing nations and the West. This remarkable growth results from a combination of factors, one of which has been unyielding attention to education in order to cultivate the human talent necessary to provide the productivity for economic growth. The Japanese education system emphasizes quality of instruction and rewards hard work. Some of the principles of the system are outlined together with a summary of the content of the curriculum, the quantity and quality of instruction, and the influence of culture and environment.

  20. Geothermal Field Developments in Japan

    SciTech Connect

    Hirakawa, Seiichi

    1983-12-15

    The present situation of the geothermal field developments in Japan is such that eight geothermal power stations are being operated, while there are sill many geothermal areas to be explored. Up to this day, the target of geothermal exploration has mainly been the areas by surface geological survey and the existing geothermal reservoirs are located not deeper than 1,500m depth. Recent geothermal energy development shows a trend from the study on vapor dominated of liquid dominated hydrothermal resources in shallow zones to that on hydrothermal resources in deeper zones. Exploration wells of 3,000m depth class have been drilled in Japan.

  1. 21 CFR 186.1555 - Japan wax.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 3 2013-04-01 2013-04-01 false Japan wax. 186.1555 Section 186.1555 Food and... Substances Affirmed as GRAS § 186.1555 Japan wax. (a) Japan wax (CAS Reg. No. 8001-39-6), also known as Japan tallow or sumac wax, is a pale yellow vegetable tallow, containing glycerides of the C19-C23...

  2. 21 CFR 186.1555 - Japan wax.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 3 2012-04-01 2012-04-01 false Japan wax. 186.1555 Section 186.1555 Food and... Substances Affirmed as GRAS § 186.1555 Japan wax. (a) Japan wax (CAS Reg. No. 8001-39-6), also known as Japan tallow or sumac wax, is a pale yellow vegetable tallow, containing glycerides of the C19-C23...

  3. 21 CFR 186.1555 - Japan wax.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 3 2011-04-01 2011-04-01 false Japan wax. 186.1555 Section 186.1555 Food and... Substances Affirmed as GRAS § 186.1555 Japan wax. (a) Japan wax (CAS Reg. No. 8001-39-6), also known as Japan tallow or sumac wax, is a pale yellow vegetable tallow, containing glycerides of the C19-C23...

  4. Innovative shotcreting system in Japan

    SciTech Connect

    Okada, Takashi

    1995-12-31

    Robotization of shotcreting has advanced remarkably in Japan in a short span of time for the purpose of avoiding exposure of human workers to adverse conditions. This paper provides an overview of various devices used in shotcreting and discusses the development of improved systems which ensure higher safety and larger productivity.

  5. AERIAL MEASURING SYSTEM IN JAPAN

    SciTech Connect

    Lyons, Craig; Colton, David

    2012-01-01

    The U.S. Department of Energy National Nuclear Security Agency’s Aerial Measuring System deployed personnel and equipment to partner with the U.S. Air Force in Japan to conduct multiple aerial radiological surveys. These were the first and most comprehensive sources of actionable information for U.S. interests in Japan and provided early confirmation to the government of Japan as to the extent of the release from the Fukushima Daiichi Nuclear Power Generation Station. Many challenges were overcome quickly during the first 48 hours; including installation and operation of Aerial Measuring System equipment on multiple U.S. Air Force Japan aircraft, flying over difficult terrain, and flying with talented pilots who were unfamiliar with the Aerial Measuring System flight patterns. These all combined to make for a dynamic and non-textbook situation. In addition, the data challenges of the multiple and on-going releases, and integration with the Japanese government to provide valid aerial radiological survey products that both military and civilian customers could use to make informed decisions, was extremely complicated. The Aerial Measuring System Fukushima response provided insight in addressing these challenges and gave way to an opportunity for the expansion of the Aerial Measuring System’s mission beyond the borders of the US.

  6. Direct Broadcasting Satellites in Japan.

    ERIC Educational Resources Information Center

    Maeda, Jiro

    The development and use of broadcasting satellites in Japan are discussed in this paper. The paper describes the medium-scale experimental broadcasting satellite, YURI, launched by NASA in 1978, and reports that experiments with YURI in the areas of basic technologies in the broadcasting satellite system, experiments on satellite control…

  7. Teaching and Learning in Japan.

    ERIC Educational Resources Information Center

    Rohlen, Thomas P., Ed.; LeTendre, Gerald K., Ed.

    The essays gathered in this volume are united by the common goal of understanding teaching and learning in Japan as it actually occurs. The essays seek to answer questions about the actual conduct of learning in different settings and at different points in the life cycle. This volume explores the expectations and associations found in specific…

  8. Japan's Eco-School Programme

    ERIC Educational Resources Information Center

    Mori, Masayuki

    2007-01-01

    Since 1997, several ministries in Japan have collaborated on an eco-school programme, which applies to both newly constructed and renovated school buildings, in an effort to make its schools more environmentally friendly. The programme equips school buildings with ecological features such as photovoltaic cells, solar thermal collectors, other new…

  9. Japan: Images of a People.

    ERIC Educational Resources Information Center

    Smigielski, Alan; Casey, Douglas, Ed.

    1997-01-01

    This issue of "Art to Zoo" focuses on Japanese art and is adapted from materials developed by the education department of the Smithsonian Institution's Freer Gallery of Art and the Arthur M. Sackler Gallery. After learning how to look at paintings, students make paper screens that resemble Japanese screens. Background essays about Japan place the…

  10. Modernization of Education in Japan.

    ERIC Educational Resources Information Center

    National Inst. for Educational Research, Tokyo (Japan).

    The document traces the development of education in Japan from the 17th century to the present. It is presented in four chapters. Chapter one discusses the Tokugawa Period (1603-1867). Principal forms of schooling were hanko for the Samurai class and terakoya for the commoners. The hanko were established for the benefit of the fiefs; objectives of…

  11. School Broadcast Utilization in Japan.

    ERIC Educational Resources Information Center

    Akiyama, Takashiro

    A school broadcast utilization survey was conducted between September and November 1975 from a total of 73,048 kindergartens, nurseries, primary schools, junior high schools, senior high schools, and special schools in Japan. Survey questions focused on the usage rates of TV, radio, and VTR as well as utilization of NHK's TV and radio school…

  12. How Japan Supports Novice Teachers

    ERIC Educational Resources Information Center

    Ahn, Ruth

    2014-01-01

    When U.S. educators first hear that Japanese teacher preparation programs require only four weeks of formal student teaching at the end of the credential program, they're appalled: How can this be? More surprising still, few new teachers in Japan (1.35 percent) leave the profession during their first year. So where are these beginning…

  13. Japan Studies Association Journal, 1998.

    ERIC Educational Resources Information Center

    Speaker, Richard B., Jr., Ed.; Kawada, Louise Myers, Ed.

    1998-01-01

    This journal presents new perspectives and materials on Japan that are engaging, relatively jargon-free, and shaped so that their usefulness in a college classroom is readily apparent. The journal represents an example of the potential for genuine scholarship that lies within interdisciplinary studies. Articles are divided among three thematic…

  14. The Japan of Today, 1982.

    ERIC Educational Resources Information Center

    Ministry of Foreign Affairs, Tokyo (Japan).

    Following an introduction which discusses the history and geography of Japan, this book focuses on topics related to this country's government, economy, social conditions, and cultural life. Topics related to government include: constitution and emperor; legislature; executive power; judiciary system; foreign relations; and defense. Topics related…

  15. The US Occupation and Japan's New Democracy

    ERIC Educational Resources Information Center

    Kumano, Ruriko

    2007-01-01

    During the US Occupation of Japan (1945-1952), a victorious America attempted to reform Japanese education by replacing Japan's tradition system of values with one that promoted American democratic values. The United States had considered the source of Japan's militarism to lie in the selfless loyalty and love of country that many older Japanese…

  16. Teaching about Japan: Lessons and Resources.

    ERIC Educational Resources Information Center

    Bernson, Mary Hammond, Ed.; Wojtan, Linda S., Ed.

    This document is a revised and updated version of two publications: "Modern Japan: An Idea Book for K-12 Teachers" and "Resources for Teaching About Japan." These lesson plans were developed by teachers who participated in a summer institute on Japan, sponsored by the East Asia Resource Center at the Jackson School of International Studies,…

  17. 75 FR 38119 - Polychloroprene Rubber From Japan

    Federal Register 2010, 2011, 2012, 2013, 2014

    2010-07-01

    ... from Japan (38 FR 33593). Following five-year reviews by the Department of Commerce (``Commerce'') and... imports of polychloroprene rubber from Japan (64 FR 47765, September 1, 1999). Following second five-year... antidumping duty finding on imports of polychloroprene rubber from Japan (70 FR 44893). The Commission is...

  18. Historical Characteristics of Adult Education in Japan.

    ERIC Educational Resources Information Center

    Miyasaka, Kosaku

    In its modern sense, adult education in Japan began after the Meiji Restoration in 1868. Until 1945, adult education functioned as an agent to indoctrinate the nationalistic and military ideology. Since World War II, Japan has adopted the democratic social system and has become a capitalist society like the West. In Japan, social education is the…

  19. FBIS report. Science and technology: Japan, March 3, 1997

    SciTech Connect

    1997-03-03

    Partial Contents: JAPAN: Sumitomo Electric Industries Develops Exhaust Purification Equipment for Buses; JAPAN: Matsushita Battery to Market Next Generation Thin Film Solar Batteries by 2000; JAPAN: Hitachi, Toshiba Use Computer Networks to Build Nuclear Power Plants; JAPAN: Monju Incident Scars Not Yet Healed; JAPAN: Encryption Key Management Debate; and JAPAN: Military Infrared R&D Reviewed.

  20. Japan`s nuclear weapons options and U.S. security interests

    SciTech Connect

    Sharman, C.H.

    1998-06-01

    Japan is a virtual nuclear weapons power. It has the scientific and technical ability to produce hundreds or even thousands of nuclear weapons, but has chosen not to do so for political reasons. This thesis examines the historical development of Japan`s nuclear energy and aerospace programs since the mid-1950s and considers the possibility that at various points in its history, Japan used these programs as a cover to insure that its nuclear weapons options remained open. This thesis analyzes internal and external factors that may have influenced Japan`s nuclear policies. External factors include regional threats, international pressures to join the Non-Proliferation Treaty, and distrust of US commitments to provide for Japan`s defense. Internal factors include Japan`s historical tradition of a strong military state and Japan`s unique nuclear allergy. While both external and internal factors have influenced the path of Japans nuclear energy and aerospace programs, internal factors will drive Japan to maintain its plutonium-based energy program and will allow Japan to remain a virtual nuclear power well into the twenty-first century.

  1. Fruit harvesting robots in Japan.

    PubMed

    Kondo, N; Monta, M; Fujiura, T

    1996-01-01

    We have developed harvesting robots for tomato, petty-tomato, cucumber and grape in Japan. These robots mainly consist of manipulators, end-effectors, visual sensors and traveling devices. These mechanisms of the robot components were developed based on the physical properties of the work objects. The robots must work automatically by themselves in greenhouses or fields, since we are considering for one operator to tend several robots in the production system. The system is modeled after Japanese agriculture which is commonly seen to produce many kinds of crops in greenhouses and in many small fields intensively. Bioproduction in space is somewhat similar to the agricultural system in Japan, because few operators have to work in a small space. Employing robots for bioproduction in space is considered desirable in near future. The following is a description of the harvesting robots. PMID:11538961

  2. Japan's research on gaseous flames

    NASA Technical Reports Server (NTRS)

    Niioka, Takashi

    1995-01-01

    Although research studies on gaseous flames in microgravity in Japan have not been one-sided, they have been limited, for the most part, to comparatively fundamental studies. At present it is only possible to achieve a microgravity field by the use of drop towers, as far as gaseous flames are concerned. Compared with experiments on droplets, including droplet arrays, which have been vigorously performed in Japan, studies on gaseous flames have just begun. Experiments on ignition of gaseous fuel, flammability limits, flame stability, effect of magnetic field on flames, and carbon formation from gaseous flames are currently being carried out in microgravity. Seven subjects related to these topics are introduced and discussed herein.

  3. Polymer composites technology in Japan

    SciTech Connect

    Karbhari, V.M.; Kukich, D.S. . Center for Composite Materials)

    1993-08-01

    In 1992, the National Science Foundation, Department of Energy, Army Research Office, and Air Force Office of Scientific Research convened a panel to assess advanced manufacturing technology for polymer composite structures in Japan. The panel was charged with comparing the levels of the technology and the industry in both the United States and Japan. The Panel on Advanced Polymer Composites Manufacturing Technology of the Japanese Technology Evaluation Center visited approximately twenty Japanese organizations over a ten-day period in December 1992. Their findings cover seven areas: aerospace, sporting goods, automotive, civil engineering, materials, manufacturing science, and product and process development methods. This report reflects the views of the authors, not necessarily those of the entire panel. The panel observed five emerging techno-paradigm shifts in Japan, previously identified by Kodama: Manufacturing companies; Business dynamics; R and D activities; Technology development; and Technology diffusion. Thus, what the panel observed in the specific area of advanced materials really reflects the overall Japanese approach to technology development. Their primary focus is on finding innovative new applications for existing materials, processes, and technologies, and on using these market opportunities to drive new development.

  4. FBIS report. Science and technology: Japan, December 3, 1996

    SciTech Connect

    1996-12-03

    Contents (selected articles): Japan: Nissan To Use Nickel-Hydrogen Battery in EV; Japan: Takii To Commercialize Cauliflower-Broccoli Hybrid; Japan: Kawasaki Steel Improves Recovery of Metals from Furnace Residue; Japan: Japan`s NEC Corp. To Develop Cost-Effective Photodection Chip; Japan: Japanese Companies Establish Research Association to Develop 16-gigabit DRAMS; Japan: Safe Operation of Nuclear Power Plants, Actual Achievements; Japan: Future for Nuclear Fuel Recycle as a Result of Monju Accident; Japan: Superconducting Magnet System Using No Liquid Helium; Japan: Hitachi`s MULTI Network Security Technologies; Japan: Defense Bureau Chief Tokita Interviewed; Japan: DRC Executive on GSDF, High Technology; and Japan: Retired Admiral on Post-Cold War MSDF Strategy.

  5. FBIS report. Science and technology: Japan, December 10, 1996

    SciTech Connect

    1996-12-10

    Contents (partial): Japan: Fabrication of Diamond Single Crystal Thin Film by Ion Beam Deposition; Japan: Hitachi Metal Develops New Semi Solid Metal Processing Technology; Japan: NTT Develops Fuel Cell System That Uses Both City Gas, LPG; Japan: Daihatsu Motor Completes Prototype EV; Japan: NIRIM Announces Success With Synthetic Bone Development; Japan: Sandoz Pharmaceuticals Plans Clinical Trials of Gene Therapy to Cerebral Tumor in Japan; Japan: MITI To Provide Aid for Residential Solar Power Generation Systems; Japan: MELCO To Provide Satellite Solar Cell Panel for SSL, USA; Japan: Japan Atomic Energy Research Institute Leads Nuclear Research; Japan: Kobe Steel`s Superconducting Magnet Ready to Go Fast; Japan: MPT To Begin Validation Test for Electric Money Implementation; and Japan: Defense Agency to Send ASDF`s Pilots to Russia for Training.

  6. FBIS report. Science and technology: Japan, May 7, 1996

    SciTech Connect

    1996-05-07

    ;Partial Contents: Japan: FH1 Aerospace Division Executive on UAV R&D; JapaN: MHI Delivers First F-2 Flight Test Model; Nuclear Technologies; Japan: Nuclear Material Research in Cross-Over Research Project; Japan: MITI To Subsidize Development of Cryptography; Defense Industries; Japan: JADI Announces FY96 Major Events Schedule; Japan: Rollout Ceremony Held for First OH-X Flight Test Model; and Japan: KHI Weapons Designer OH-X Development.

  7. Us-Japan cooperation on safeguards

    SciTech Connect

    Beddingfield, David H; Menlove, Howard O; Hori, Masato; Kawakubo, Yoko; Mcclelland - Kerr, J

    2009-01-01

    There is a long history of collaborative safeguards development between the United States and Japan. Japan has built, and continues to expand, the largest civil nuclear fuel cycle under full-scope IAEA safeguards in world. This development has posed unique challenges to the international safeguards system. Safeguards developments made through the US-Japan cooperation to address these unique challenges have significantly impacted the technologies deployed for international safeguards applications around the world.

  8. Children in Japan and multimedia.

    PubMed

    Shimauchi, Y

    1999-01-01

    Many parents in Japan today are very concerned and have daily problems with their children over the following kind of issues concerning video games, multimedia, and similar devices. 1) Is children's enthusiasm for video games actually harming their growth (physically or mentally)? 2) Is there any way that video games can help children in the future? For example, will playing these games help children learn to use computers or develop their power of thought? 3) Will excessive enthusiasm for TV games undermine our basic lifestyle? Is the time they spend studying at home or playing outside actually decreasing? 4) Will the methods of communication brought about by computers, pagers, and cellular phones weaken human relations among children? 5) Will being immersed in a virtual world created by computers result in a diminished sense of reality? The causes of this uneasiness may be traced to parents' own anxieties and concerns about the exceedingly rapid growth of the "information society" of today, together with the fact that their children are directly caught up in the deluge of this information and multimedia society. The development of media has coincided with the growth of today's adults, but children are immersed in a media-filled environment from the day they are born. In Japan, there are now children who can play video games before even learning to write. No one can predict what kind of adults these children will grow to be in the future, and it is fair to say that the most parents and children in Japan are being tossed about on the waves of this information explosion. At this international symposium, we hope to hear the many views that are held around the world concerning children and multimedia. PMID:10770069

  9. Recent cryocooler progress in Japan

    NASA Astrophysics Data System (ADS)

    Matsubara, Y.

    1985-05-01

    The progress of cryocoolers and related devices in Japan is reviewed. The Japanese National Railways has developed the light weight 4 K on-board refrigerators since 1977 as part of the MAGLEV train program. Superconducting and cryogenic fundamental technology was examined which included high performance cryocooler, magnetic refrigerator and superfluid refrigeration. Space cryogenics such as the cooling systems of IR-detectors was studied. Cryocooler for special applications such as cryopump, NMR-CT and JJ devices was investigated. Compact heat exchangers, high performance regenerators and reliable compressors are investigated as a critical component technology.

  10. Solid waste management in Japan

    SciTech Connect

    Naito, S.

    1995-09-01

    On Friday 17 June 1994, as the invited speaker of the International Congress of IWM/ISWA at Torbay, UK the author presented a paper of {open_quotes}A framework for success: the role of legislation{close_quotes}. THis was to introduce the amendment of Waste Disposal Cleansing Law and the Basic Environment Law in 1991, but the combination of the two amended laws has enforced promoting and assisting the fulfillment of the responsibilities of corporations and citizens. In addition to such presentation, the author pointed out a new manner of solid waste management (SWM) in Japan.

  11. Teachers' Unions and the Politics of Education in Japan. SUNY Series on Japan in Transition.

    ERIC Educational Resources Information Center

    Aspinall, Robert W.

    In 1989, the Japan Teachers' Union, Nikkyoso, split into two unions after 2 years of factional infighting. Japan has two political camps, the governing conservative Liberal Democratic Party and the left-wing Japan Socialist Party. The teachers' union is a powerful member in the camp of the latter. This book incorporates studies of the links…

  12. Transformer Efficiency Assessment - Okinawa, Japan

    SciTech Connect

    Thomas L. Baldwin; Robert J. Turk; Kurt S. Myers; Jake P. Gentle; Jason W. Bush

    2012-05-01

    The US Army Engineering & Support Center, Huntsville (USAESCH), and the US Marine Corps Base (MCB), Okinawa, Japan retained Idaho National Laboratory (INL) to conduct a Transformer Efficiency Assessment of “key” transformers located at multiple military bases in Okinawa, Japan. The purpose of this assessment is to support the Marine Corps Base, Okinawa in evaluating medium voltage distribution transformers for potential efficiency upgrades. The original scope of work included the MCB providing actual transformer nameplate data, manufacturer’s factory test sheets, electrical system data (kWh), demand data (kWd), power factor data, and electricity cost data. Unfortunately, the MCB’s actual data is not available and therefore making it necessary to de-scope the original assessment. Note: Any similar nameplate data, photos of similar transformer nameplates, and basic electrical details from one-line drawings (provided by MCB) are not a replacement for actual load loss test data. It is recommended that load measurements are performed on the high and low sides of transformers to better quantify actual load losses, demand data, and power factor data. We also recommend that actual data, when available, be inserted by MCB Okinawa where assumptions have been made and then the LCC analysis updated. This report covers a generalized assessment of modern U.S. transformers in a three level efficiency category, Low-Level efficiency, Medium-Level efficiency, and High-Level efficiency.

  13. Transformer Efficiency Assessment - Okinawa, Japan

    SciTech Connect

    Thomas L. Baldwin; Robert J. Turk; Kurt S. Myers; Jake P. Gentle; Jason W. Bush

    2012-08-01

    The US Army Engineering & Support Center, Huntsville (USAESCH), and the US Marine Corps Base (MCB), Okinawa, Japan retained Idaho National Laboratory (INL) to conduct a Transformer Efficiency Assessment of “key” transformers located at multiple military bases in Okinawa, Japan. The purpose of this assessment is to support the Marine Corps Base, Okinawa in evaluating medium voltage distribution transformers for potential efficiency upgrades. The original scope of work included the MCB providing actual transformer nameplate data, manufacturer’s factory test sheets, electrical system data (kWh), demand data (kWd), power factor data, and electricity cost data. Unfortunately, the MCB’s actual data is not available and therefore making it necessary to de-scope the original assessment. Note: Any similar nameplate data, photos of similar transformer nameplates, and basic electrical details from one-line drawings (provided by MCB) are not a replacement for actual load loss test data. It is recommended that load measurements are performed on the high and low sides of transformers to better quantify actual load losses, demand data, and power factor data. We also recommend that actual data, when available, be inserted by MCB Okinawa where assumptions have been made and then the LCC analysis updated. This report covers a generalized assessment of modern U.S. transformers in a three level efficiency category, Low-Level efficiency, Medium-Level efficiency, and High-Level efficiency.

  14. On earthquake prediction in Japan.

    PubMed

    Uyeda, Seiya

    2013-01-01

    Japan's National Project for Earthquake Prediction has been conducted since 1965 without success. An earthquake prediction should be a short-term prediction based on observable physical phenomena or precursors. The main reason of no success is the failure to capture precursors. Most of the financial resources and manpower of the National Project have been devoted to strengthening the seismographs networks, which are not generally effective for detecting precursors since many of precursors are non-seismic. The precursor research has never been supported appropriately because the project has always been run by a group of seismologists who, in the present author's view, are mainly interested in securing funds for seismology - on pretense of prediction. After the 1995 Kobe disaster, the project decided to give up short-term prediction and this decision has been further fortified by the 2011 M9 Tohoku Mega-quake. On top of the National Project, there are other government projects, not formally but vaguely related to earthquake prediction, that consume many orders of magnitude more funds. They are also un-interested in short-term prediction. Financially, they are giants and the National Project is a dwarf. Thus, in Japan now, there is practically no support for short-term prediction research. Recently, however, substantial progress has been made in real short-term prediction by scientists of diverse disciplines. Some promising signs are also arising even from cooperation with private sectors. PMID:24213204

  15. Great East Japan Earthquake Tsunami

    NASA Astrophysics Data System (ADS)

    Iijima, Y.; Minoura, K.; Hirano, S.; Yamada, T.

    2011-12-01

    The 11 March 2011, Mw 9.0 Great East Japan Earthquake, already among the most destructive earthquakes in modern history, emanated from a fault rupture that extended an estimated 500 km along the Pacific coast of Honshu. This earthquake is the fourth among five of the strongest temblors since AD 1900 and the largest in Japan since modern instrumental recordings began 130 years ago. The earthquake triggered a huge tsunami, which invaded the seaside areas of the Pacific coast of East Japan, causing devastating damages on the coast. Artificial structures were destroyed and planted forests were thoroughly eroded. Inrush of turbulent flows washed backshore areas and dunes. Coastal materials including beach sand were transported onto inland areas by going-up currents. Just after the occurrence of the tsunami, we started field investigation of measuring thickness and distribution of sediment layers by the tsunami and the inundation depth of water in Sendai plain. Ripple marks showing direction of sediment transport were the important object of observation. We used a soil auger for collecting sediments in the field, and sediment samples were submitted for analyzing grain size and interstitial water chemistry. Satellite images and aerial photographs are very useful for estimating the hydrogeological effects of tsunami inundation. We checked the correspondence of micro-topography, vegetation and sediment covering between before and after the tsunami. The most conspicuous phenomenon is the damage of pine forests planted in the purpose of preventing sand shifting. About ninety-five percent of vegetation coverage was lost during the period of rapid currents changed from first wave. The landward slopes of seawalls were mostly damaged and destroyed. Some aerial photographs leave detailed records of wave destruction just behind seawalls, which shows the occurrence of supercritical flows. The large-scale erosion of backshore behind seawalls is interpreted to have been caused by

  16. John Ogbu and Minority Education in Japan

    ERIC Educational Resources Information Center

    Okubo, Yuko

    2006-01-01

    This paper discusses John Ogbu and his work in the context of Japan. First, his interest in Japan, his interactions with Japanese educators and researchers, and their responses to his work are discussed. Then Ogbu's cultural model from the author's fieldwork experiences is examined and a relational and dialectic perspective is proposed to study…

  17. Japan: Language Policy and Planning in Transition

    ERIC Educational Resources Information Center

    Gottlieb, Nanette

    2008-01-01

    This monograph discusses the language situation in Japan, with an emphasis on language planning and policy. Japan has long considered itself to be a monoethnic and therefore monolingual society, despite the existence of substantial old-comer ethnic minorities, and this--with the instrumental exception of English--has been reflected in its language…

  18. People of Japan: Building Bridges of Understanding.

    ERIC Educational Resources Information Center

    Brigham Young Univ., Provo, UT. Language Research Center.

    This booklet was designed to facilitate interactions and communication with the people of Japan by providing information about their customs, attitudes and other cultural characteristics which influence their actions and values. A brief description of Japan is given, covering the following: history, government, the economy, education,…

  19. Crisis of Public Broadcasting Japan's Case.

    ERIC Educational Resources Information Center

    Kabira, Chosei

    The public broadcasting service in Japan, the NHK, is a nongovernmental, noncommercial, and nonprofit making organization that is financed solely by fees collected from viewing households. At present, 80% of the total number of households in Japan have a contract with NHK and 96.5% of these households have actually paid the receiving fee to NHK.…

  20. Linguistic Minorities and Education in Japan.

    ERIC Educational Resources Information Center

    Maher, John

    1997-01-01

    The ideology of a monolingual and monoracial Japan is being challenged by increasing language diversity in communities where Ainu, Ryukyuan, Chinese, English, Japanese Sign Language, Korean, and other languages are spoken. Government policies and school textbooks still resist the notion of a multilingual Japan. (SK)

  1. 75 FR 57980 - Polychloroprene Rubber From Japan

    Federal Register 2010, 2011, 2012, 2013, 2014

    2010-09-23

    ... interested parties did not participate in this sunset review * * *.'' (75 FR 51981). Accordingly, pursuant to... COMMISSION Polychloroprene Rubber From Japan AGENCY: United States International Trade Commission. ACTION... whether revocation of the antidumping duty finding on polychloroprene rubber from Japan would be likely...

  2. The Role of German in Japan.

    ERIC Educational Resources Information Center

    Sang, Juergen

    This historical overview of German studies in Japan, dating from the birth of modern Japan in the 1870's to the present time, includes commentary on the nature and scope of existing language programs. The importance of German idealism--reflected in the philosophy of Kant, Hegel, Schopenhauer, Nietzsche, and Marx--on Japanese culture is noted.…

  3. Learning by the Aged in Japan.

    ERIC Educational Resources Information Center

    Sekiguchi, Reiko W.

    This paper discusses demographic changes in Japan, the sources of pleasure of the retired Japanese senior citizen, and lifelong learning. It also describes a study that examined learning preferences of Japanese senior citizens. Data for 1983 show that life expectancy has increased in Japan to 74.20 years for males and 79.78 for females. The level…

  4. Japan's Winning Margins. Management, Training, and Education.

    ERIC Educational Resources Information Center

    Lorriman, John; Kenjo, Takashi

    This book explains the fundamental reasons for Japan's astonishing commercial success in relation to its Western competitors. Chapter 1 is an introduction. Chapter 2 discusses implications of Japanese history for education, training, and management. Chapter 3 looks at the first winning margin--education. It covers the following: Japan's long…

  5. Type 1 diabetes in Japan.

    PubMed

    Kawasaki, E; Matsuura, N; Eguchi, K

    2006-05-01

    Type 1 diabetes is a multifactorial disease which results from a T-cell-mediated autoimmune destruction of the pancreatic beta cells in genetically predisposed individuals. The risk for individuals of developing type 1 diabetes varies remarkably according to country of residence and race. Japan has one of the lowest incidence rates of type 1 diabetes in the world, and recognises at least three subtypes of the condition: acute-onset ('classical'), slow-onset, and fulminant type 1 diabetes. The incidence rate of type 1 diabetes in children aged 0-14 years in Japan increased over the period from 1973-1992, but remained constant over the last decade, averaging 2.37 cases per 100,000 persons per year; the incidence does not appear to have increased in older age groups. Although there are few reports regarding the incidence and prevalence of type 1 diabetes in adult-onset patients, it appears that the prevalence of type 1 diabetes in adults is more than twice that in childhood-onset patients and that two-thirds of them have a slow-onset form of type 1 diabetes. Differences and similarities in the association of MHC and non-MHC genes with type 1 diabetes are observed in Japan and in countries with Caucasoid populations. Highly susceptible class II HLA haplotypes identified in patients of Caucasoid origin are rarely seen in Japanese patients, whereas protective haplotypes are universal. Non-MHC genes associated with susceptibility to type 1 diabetes in both Japanese and Caucasoid patients include polymorphisms in the insulin gene, the cytotoxic T-lymphocyte antigen 4 (CTLA4) gene, the interleukin-18 (IL18) gene and the major histocompatibility complex class I chain-related gene A (MICA) gene. Fulminant type 1 diabetes is a unique subtype of type 1 diabetes that accounts for about 20% of acute-onset type 1 diabetes, and is seen mainly in adults. The challenge for the future is to investigate the underlying pathogenesis of beta cell destruction, including the genetic or

  6. Penicillin and the reconstruction of Japan.

    PubMed

    Cozzoli, Daniele

    2014-01-01

    This paper explores postwar American strategies regarding penicillin in Japan. Perceived as both an American gift and a symbol of reconstruction, penicillin played a singular role in Washington's postwar policies towards Europe and Japan. Washington encouraged US pharmaceutical companies to penetrate Europe but sought to protect intra-European trade. In Japan, however, importing penicillin from the US or establishing private American factories was forbidden. Jackson W. Foster implemented a smaller-scale, military-directed version of the US's wartime penicillin project. In this paper, it is argued that the MacArthur administration aimed to boost Japanese penicillin production and transfer American industrial culture to Japan. This was initially a major success. However, the Japanese pharmaceutical industry failed to break down barriers to market entry established by first movers and, consequently, was uncompetitive throughout the twentieth century. This paper regards the American penicillin project in Japan as a factor in the weakness of the postwar Japanese pharmaceutical industry. PMID:26054211

  7. Cultural characteristics of nursing practice in Japan.

    PubMed

    Tsujimura, Mayuko; Ishigaki, Kazuko; Yamamoto-Mitani, Noriko; Fujita, Junko; Katakura, Naoko; Ogata, Yasuko; Mochizuki, Yuki; Okamoto, Yuko; Shinohara, Yuko

    2016-04-01

    The population of Japan has become multi-cultural, and there is more demand for culturally competent nursing care. The purpose of this study was to explore cultural characteristics of nursing practice in Japan focusing on behaviour. We interviewed 25 professionals with experience in or knowledge of nursing practice both in Japan and either the United States, the United Kingdom, Sweden, Thailand or South Korea. Qualitative content analysis has yielded three themes for cultural characteristics of nursing practice in Japan: practice expectations, communication and relationships with patients. Practice expectations for nurses in Japan involved various aspects; nurses conducted a wide range of basic nursing tasks, including bed baths and toileting. They often relied on non-verbal communication to deliver thoughtfulness and perceptiveness. They typically show deference to doctors and colleagues, emphasizing building and maintaining harmony with them. This emphasis on a multifaceted, non-verbal, and harmonious approach seemed characteristic of practice among Japanese nurses. PMID:27184703

  8. Industrial waste management in Japan

    SciTech Connect

    Hirota, Y.

    1986-12-01

    Systematic management for industrial waste in Japan has been carried out based on the Waste Disposal and Public Cleansing Law which was enacted in 1970. The law and its ordinances designate 19 kinds of waste materials discharged from business activities as industrial waste and prescribe the generator's responsibility, requirements for treatment contractors, standards for consignment, specific personnel, etc. from the view of proper management. And they also prescribe disposal standards, structure, and maintenance standards for treatment facilities, including final disposal sites, from the view of proper treatment and disposal. The Standard for Verification provides criteria to categorize as hazardous or nonhazardous industrial waste which is subjected to treatment and disposal in conformity with each standard. The fundamental policies to cope with industrial waste focus on reduction of generation, promotion of recycling, establishment of a comprehensive information management system and participation of the public which can contribute well to prevent environmental pollution caused by inappropriate management of industrial waste.

  9. Electric propulsion works in Japan

    NASA Astrophysics Data System (ADS)

    Nakamura, Yoshihiro; Kuriki, Kyoichi

    The R & D works on MPD thruster system and ion engine system in Japan are reviewed. A 1 kW class MPD thruster system, for which the flight test will be made onboard a small space platform in early 1990's, has experienced preliminary endurance tests of 1 million shots twice. From these tests, thermal control system, automated operation system and electrode mass loss assessment were established. A 20 mN class xenon ion engine system was determined to be developed and be tested onboard the ETS-VI to be launched by a H-II rocket in 1992. 500 hour operation tests of the thruster were conducted and showed the reduction of erosion rates of accelerator grid, etc. whose surfaces were coated with low sputter materials. A system interface tests were also made to see the compatibilities between subsystems. Performance improvement studies of xenon ion thruster and its test facility are going on.

  10. Electronic manufacturing and packaging in Japan

    NASA Technical Reports Server (NTRS)

    Kelly, Michael J.; Boulton, William R. (Editor); Kukowski, John A.; Meieran, Eugene S.; Pecht, Michael; Peeples, John W.; Tummala, Rao R.

    1995-01-01

    This report summarizes the status of electronic manufacturing and packaging technology in Japan in comparison to that in the United States, and its impact on competition in electronic manufacturing in general. In addition to electronic manufacturing technologies, the report covers technology and manufacturing infrastructure, electronics manufacturing and assembly, quality assurance and reliability in the Japanese electronics industry, and successful product realization strategies. The panel found that Japan leads the United States in almost every electronics packaging technology. Japan clearly has achieved a strategic advantage in electronics production and process technologies. Panel members believe that Japanese competitors could be leading U.S. firms by as much as a decade in some electronics process technologies. Japan has established this marked competitive advantage in electronics as a consequence of developing low-cost, high-volume consumer products. Japan's infrastructure, and the remarkable cohesiveness of vision and purpose in government and industry, are key factors in the success of Japan's electronics industry. Although Japan will continue to dominate consumer electronics in the foreseeable future, opportunities exist for the United States and other industrial countries to capture an increasingly large part of the market. The JTEC panel has identified no insurmountable barriers that would prevent the United States from regaining a significant share of the consumer electronics market; in fact, there is ample evidence that the United States needs to aggressively pursue high-volume, low-cost electronic assembly, because it is a critical path leading to high-performance electronic systems.

  11. Development of cancer cooperative groups in Japan.

    PubMed

    Fukuda, Haruhiko

    2010-09-01

    Investigator-initiated clinical trials are essential for improving the standard of care for cancer patients, because pharmaceutical companies do not conduct trials that evaluate combination chemotherapy using drugs from different companies, surgery, radiotherapy or multimodal treatments. Government-sponsored cooperative groups have played a vital role in developing cancer therapeutics since the 1950s in the USA; however, the establishment of these groups in Japan did not take place until 30 years later. Methodological standards for multicenter cancer clinical trials were established in the 1980s by the National Cancer Institute and cooperative groups. The Japan Clinical Oncology Group, one of the largest cooperative groups in the country, was instituted in 1990. Its data center and operations office, formed during the 1990s, applied the standard methods of US cooperative groups. At present, the Japan Clinical Oncology Group consists of 14 subgroups, a Data Center, an Operations Office, nine standing committees and an Executive Committee represented by the Japan Clinical Oncology Group Chair. Quality control and quality assurance at the Japan Clinical Oncology Group, including regular central monitoring, statistical methods, interim analyses, adverse event reporting and site visit audit, have complied with international standards. Other cooperative groups have also been established in Japan since the 1980s; however, nobody figures out all of them. A project involving the restructuring of US cooperative groups has been ongoing since 2005. Learning from the success of this project will permit further progress of the cancer clinical trials enterprise in Japan. PMID:20670961

  12. Explaining unusual winter lightning in Japan

    NASA Astrophysics Data System (ADS)

    Shindo, Takatoshi; Ishii, Masaru; Williams, Earle

    2011-11-01

    Third International Symposium on Winter Lightning; Sapporo, Japan, 15-16 June 2011 Japan's meteorological setting in winter is unusual: It is an island in a relatively warm sea frequently overswept by colder air from Siberia. This sets up appreciable atmospheric instability in the fringe of the land adjacent to the Sea of Japan. Heavy snowstorms overlap the edge of the island and produce extraordinarily energetic lightning flashes that initiate from points on the ground (known as ground-to-cloud (GC) strokes) and wreak havoc on power lines and, more recently, wind turbines. These troublesome and costly conditions set the stage for the third in a series of conferences on winter lightning.

  13. Economics Teachers' Attitudes about and Treatment of Japan.

    ERIC Educational Resources Information Center

    Ellington, Lucien; Muntean, James

    1991-01-01

    Discusses research into high school economics teachers' attitudes about U.S.-Japan trade policy and teaching about Japan. Compares teachers' and general public's responses to Harris poll on U.S.-Japan trade relations. Reports that, although 91 percent of teachers believe they should teach about Japan, only 53 percent spend 2-5 class periods on…

  14. Contemporary Japan: A Teaching Workbook. Third Edition Revised.

    ERIC Educational Resources Information Center

    Martin, Roberta, Ed.; And Others

    Designed to supplement and enliven standard textbook presentations of Japan, this workbook, through student exercises, seeks to answer some of the most common questions U.S. students have about Japan and its people. Classes exploring only one aspect of Japan as well as those seeking an integrated picture of Japan's traditional culture and…

  15. Teaching Primary School Children about Japan through Art. ERIC Digest.

    ERIC Educational Resources Information Center

    Ward, Patricia Berg

    There are a variety reasons for teaching about Japan. Many students in the United States are of Japanese heritage; Japan is the second largest trading partner of the United States; and some healing still needs to occur between the United States and Japan because of the damage and pain of World War II. Further, the Unites States and Japan share the…

  16. US--Japan energy policy consultations

    SciTech Connect

    Not Available

    1989-01-01

    These papers, from the US--Japan Energy Policy Consultations Meeting in Hawaii, deal with topics relating to: energy outlook; electric utilities; nuclear energy; coal and petroleum based energies; and new energy source development. (JF)

  17. Suicide among foreign residents of Japan.

    PubMed

    Lester, David; Saito, Yukio; Ben Park, B C

    2011-02-01

    The suicide rate of Koreans living in Japan is twice as high as that of Koreans in South Korea. Reasons for this high suicide rate are discussed, including effects of economic crises and discrimination. PMID:21526599

  18. History of Nuclear Fusion Research in Japan

    NASA Astrophysics Data System (ADS)

    Iguchi, Harukazu; Matsuoka, Keisuke; Kimura, Kazue; Namba, Chusei; Matsuda, Shinzaburo

    In the late 1950s just after the atomic energy research was opened worldwide, there was a lively discussion among scientists on the strategy of nuclear fusion research in Japan. Finally, decision was made that fusion research should be started from the basic, namely, research on plasma physics and from cultivation of human resources at universities under the Ministry of Education, Science and Culture (MOE). However, an endorsement was given that construction of an experimental device for fusion research would be approved sooner or later. Studies on toroidal plasma confinement started at Japan Atomic Energy Research Institute (JAERI) under the Science and Technology Agency (STA) in the mid-1960s. Dualistic fusion research framework in Japan was established. This structure has lasted until now. Fusion research activities over the last 50 years are described by the use of a flowchart, which is convenient to glance the historical development of fusion research in Japan.

  19. Making "World-Class Universities": Japan's Experiment.

    ERIC Educational Resources Information Center

    Yonezawa, Akiyoshi

    2003-01-01

    Discusses the qualities of "world-class" universities and the measures that governments and academia implemented to create them. The article suggests way in which Japan can elevate its universities to "world-class" status. (SWM)

  20. Eponyms in dermatology literature linked to Japan

    PubMed Central

    Al Aboud, Ahmad; Al Aboud, Khalid

    2012-01-01

    There are many different eponyms in common use in dermatology today, originating from a variety of countries worldwide. This review discusses a selection of dermatological eponyms that are linked to Japan. PMID:22291476

  1. Star Week - a Successful Campaign in Japan -

    NASA Astrophysics Data System (ADS)

    Watanabe, Jun-Ichi; Ono, Tomoko; Star Week Committee

    There are several hundreds of astronomical facilities for general public in Japan including planetariums museums and public observatories. In order to connect these facilities and to make good collaborations for education purpose

  2. Cord blood transplantation in Japan.

    PubMed

    Uchida, Naoyuki

    2016-05-01

    Cord blood transplantation (CBT) has increasingly been used in Japan and the annual number of CBT now exceeds 1,200. The cumulative number of CBT reached 12,853 in 2015, accounting for almost 1/3 of total CBT performed worldwide. It is true that smaller body size and lower costs, as compared to western countries, have been advantages for Japanese people in using CB as graft alternative. In addition, several novel findings regarding serious issues following CBT have been obtained, which further enhanced the use of CB. First, several mechanisms of engraftment failure following CBT other than cell dose have been reported, such as the presence of donor-specific anti-HLA antibodies or the development of hemophagocytic syndrome. Second, unique profiles of infectious complications following CBT have been reported, such as higher incidences of early bacterial infections and HHV-6 encephalitis, as compared to those following bone marrow (BM)/peripheral blood (PB) transplants. Third, the incidence of disease relapse was comparable to those following BM/PB transplants. Novel pre-transplant conditioning regimens using intravenous busulfan have been investigated with promising results being obtained to date. A recent analysis of Japanese transplant registry data revealed similar survival following CBT to HLA-matched unrelated BM/PB transplants. PMID:27263776

  3. On Earthquake Prediction in Japan

    PubMed Central

    UYEDA, Seiya

    2013-01-01

    Japan’s National Project for Earthquake Prediction has been conducted since 1965 without success. An earthquake prediction should be a short-term prediction based on observable physical phenomena or precursors. The main reason of no success is the failure to capture precursors. Most of the financial resources and manpower of the National Project have been devoted to strengthening the seismographs networks, which are not generally effective for detecting precursors since many of precursors are non-seismic. The precursor research has never been supported appropriately because the project has always been run by a group of seismologists who, in the present author’s view, are mainly interested in securing funds for seismology — on pretense of prediction. After the 1995 Kobe disaster, the project decided to give up short-term prediction and this decision has been further fortified by the 2011 M9 Tohoku Mega-quake. On top of the National Project, there are other government projects, not formally but vaguely related to earthquake prediction, that consume many orders of magnitude more funds. They are also un-interested in short-term prediction. Financially, they are giants and the National Project is a dwarf. Thus, in Japan now, there is practically no support for short-term prediction research. Recently, however, substantial progress has been made in real short-term prediction by scientists of diverse disciplines. Some promising signs are also arising even from cooperation with private sectors. PMID:24213204

  4. [Legislations on radiation in Japan].

    PubMed

    Okazaki, Ryuji

    2013-10-01

    The Atomic Energy Basic Act was the first law for the prevention of radiation damage in Japan, and was enforced in 1955. The law focused on the research, development and promotion of the use of atomic energy. With an increase in the importing of radioactive isotopes from foreign countries, the Act on Prevention of Radiation Disease Due to Radioisotopes was established under the jurisdiction of the Science and Technology Agency in 1957 and enforced in 1958. The Nuclear Regulation Authority began as an extra-ministerial committee of the Ministry of the Environment in 2012 and has jurisdiction in the area of ionizing radiations regulations.Substantial regulation has been provided by the Labor Standards Act, and the Ordinance on Prevention of Ionizing Radiation Hazards was established as the eleventh ordinance of the Ministry of Labor in 1959. There have been many revisions to the Ordinance, including revisions following the Fukushima Daiichi Nuclear Power Plant accident in 2011. This paper explains the Act on Prevention of Radiation Disease Due to Radioisotopes, the Ordinance on Prevention of Ionizing Radiation Hazards, and workmen's accident authorization. PMID:24107339

  5. [Metallurgic drugs in ancient Japan].

    PubMed

    Sugiyama, S

    2001-01-01

    Advancements in metallurgic and pharmaceutical chemistry in ancient Japan were made by people like Mangan-Shonin, who combined elements from Shinto, Buddhism, and Taoism to take advantage of technologies brought by Chinese and Korean immigrants. The Shonin himself, though it may be considered a wild speculation, could well be such an immigrant. Along with the immigrants, the Shonin established government-subsidized temples (Jingu-ji, Jogaku-ji) throughout the country under sponsorship by the Imperial Court for the purpose of raising funds through private donations. Research and educational activities conducted in these temples ultimately resulted in a well-established body of chemical engineers who could excavate chemical substances as well as alter their natures. According to a list of regional products (Sasaki,19) 1972) up to the 14th century, these chemical substances and their derivative products included iron from the Hitachi region, cast metal from Shimotsuke, swords from Sagami, face powder (lead carbonate) from Ise, mercury, and gold. PMID:11776993

  6. Research and improving web accessibility in Japan

    NASA Astrophysics Data System (ADS)

    Uchida, Hitoshi; Ando, Masaya; Ohta, Kenji; Shimizu, Hirokazu; Hayashi, Yoshio; Ichihara, Yasuyo G.; Yamazaki, Ryoji

    2001-12-01

    Internet use by the people with disabilities and the elderly in Japan is still low, but growing. However, the majority of web contents written in Japanese, even government sites, have very low accessibility. This paper introduces the active measures being taken in Japan to improve such conditions; consideration of a web contents accessibility guideline tailored to the unique characteristics of the Japanese language, development of a system to evaluate accessibility and implementation of actual trials.

  7. Update on Japan's Contribution to the ISW

    NASA Astrophysics Data System (ADS)

    Yumoto, K.; Hayakawa, H.; Obara, T.; Watari, S.; Stpp Sub-Committee Of Japan

    2011-12-01

    We are conducting three initiatives in Japan, in order to accomplish the ISWI objectives. The first is an instrument array program to deploy new and existing observation networks. The second is data coordination to develop predictive models using ISWI data. And the third is training, education (that is capacity building), and public outreach programs, such as the ISWI Newsletter. An update on Japan's Contribution to the ISWI in 2010 will be summarized in the present paper.

  8. Distant Mt. Fuji, Island of Honshu Japan

    NASA Technical Reports Server (NTRS)

    1992-01-01

    This distant view of Mt. Fuji, on the main home island of Honshu, Japan (34.0N, 139.0E) was taken from about 450 miles to the south. Evan at that great distance, the majestic and inspiring Mt. Fuji is still plainly visible and easily recognized as a world renowned symbol of Japan. The snow capped extinct volcano lies just a few miles south of Tokyo.

  9. Universal varicella vaccine immunization in Japan.

    PubMed

    Yoshikawa, Tetsushi; Kawamura, Yoshiki; Ohashi, Masahiro

    2016-04-01

    In 1974, Japanese scientists developed a live attenuated varicella vaccine based on the Oka strain. The efficacy of the vaccine for the prevention of varicella has been primarily demonstrated in studies conducted in the United States following the adoption of universal immunization using the Oka strain varicella vaccine in 1996. Although the vaccine was developed by Japanese scientists, until recently, the vaccine has been administered on a voluntary basis in Japan resulting in a vaccine coverage rate of approximately 40%. Therefore, Japan initiated universal immunization using the Oka strain varicella vaccine in November 2014. Given the transition from voluntary to universal immunization in Japan, it will also be important to monitor the epidemiology of varicella and herpes zoster. The efficacy and safety of co-administration of the varicella vaccine and measles, mumps, and rubella vaccine have been demonstrated in many countries; however, there was no data from Japan. In order to adopt the practice of universal immunization using the Oka strain varicella vaccine in Japan, data demonstrating the efficacy and safety of co-administration of varicella vaccine and measles and rubella (MR) vaccine were required. Additionally, we needed to elucidate the appropriate time interval between the first and second administrations of the vaccine. It is also important to differentiate between wild type and Oka vaccine type strains in herpes zoster patient with past history of varicella vaccine. Thus, there are many factors to consider regarding the adoption of universal immunization in Japan to control varicella zoster virus (VZV) infections. PMID:26944711

  10. Current state of cardiac rehabilitation in Japan.

    PubMed

    Goto, Yoichi

    2014-01-01

    In Japan, metabolic risk factors have been increasing due to the westernization and urbanization of lifestyle. This justifiably raises a concern that the incidence of coronary heart disease (CHD) in Japan will increase over time, and indeed, recent epidemiological studies in Japan suggest the incidence of acute myocardial infarction (AMI) is increasing. Cardiac rehabilitation (CR) in Japan has been traditionally performed in the inpatient setting. To obtain reimbursement, a CR facility must fulfill certain criteria including being a medical institution with a cardiology/cardiac surgery section which has at least a cardiologist/cardiac surgeon and an experienced CR physician as full-time employees. These criteria create challenges to the availability of outpatient CR after hospital discharge. A recent analysis found outpatient CR participation rate was estimated to be between 3.8 and 7.6% in Japan. This review describes recent trends in the incidence of AMI and the current status of the use of CR in Japan. PMID:24607022

  11. Tertiary geothermal events around the Japan Arc

    NASA Astrophysics Data System (ADS)

    Itoh, Yasuto

    1991-11-01

    The thermal history through the late Tertiary around the Japan Arc is described by analyzing a number of geological data obtained from boreholes. Based on an empirical model of time-temperature-coalification, the burial history and coal ranks in a deep offshore borehole (MITI Tottori-Oki) reveal that the western part of the Sea of Japan was subjected to remarkable thermal events around middle Miocene and Quaternary times, during which voluminous igneous rocks erupted within Southwest Japan. Considering the tectonic context around the Japan Arc, it is most probable that the thermal event in the middle Miocene was brought about by the extensive continental rifting and formation of the Sea of Japan. The area of higher Quaternary temperatures in the upper mantle, which has been delineated through heat-flow measurements, coincides with the distribution of the contemporaneous alkaline volcanics, suggesting that the characteristic intra-plate volcanism and the latest thermal event can be related to the regional influx of hot asthenosphere beneath Southwest Japan.

  12. Ocean Science Communication in Japan

    NASA Astrophysics Data System (ADS)

    Ichikawa, H.

    2011-12-01

    Ocean literacy and education panel (OLEP) of the Oceanographic Society of Japan (JOS) has been established in 2003 for sharing the ocean literacy with the public and promoting the ocean science education in school and college. Its activities include publishing reference books and electronic teaching materials for primary school teachers and students, conducting surveys on the people's consciousness on the ocean, and supporting the events such as 'Ocean Science Cafe' for the public, oceanographer's talks in class room and sea side, and seminars on board of research vessel for high-school teachers and students. Its activities are announced to the public in its website and through Twitter. The records are available to the public in the websites. Some JOS members including me are telling the public the basic knowledge of ocean science, additional explanations to scientific topics in mass media, their thoughts on the ocean, the science, and STEM education, and their daily life such as travels, meetings and cruises through their own private websites, blogs, and accounts in Twitter and Facebook. In this presentation, as a coordinator of the 'Ocean Science Cafe', I will indicate how well it has worked as a good method for promoting mutual communication between non-professional citizens and oceanographers, and changed a scientist to a better citizen. Also, as an ocean science blogger, I will mention a good effect of the mutual communication with the public from my experience. It is concluded that the science communication by new media should not be one-way but really two-way to understand well what people wish to know and have difficulties to understand, and where they stop learning.

  13. Challenges and solutions ensuring EUVL photomask integrity

    NASA Astrophysics Data System (ADS)

    Brux, O.; Dreß, P.; Schmalfuß, H.; Jonckheere, R.; Koolen-Hermkens, W.

    2012-06-01

    Industry roadmaps indicate that the introduction of Extreme Ultraviolet Lithography (EUVL) is on track for high volume manufacturing. Although, there has been significant progress in each of the individual subsets of the EUVL infrastructure, the absolute management of the process outside of the scanner and up to the point-of-exposure has been highlighted as critical requirement for the adoption of EUVL. Significant changes in the EUV system environment and mask architecture are driving a zero process tolerance level. Any unforeseen contamination introduced to the scanner environment from the EUV mask could cause considerable downtime and yield loss. Absolute mask integrity at the point-of-exposure must be guaranteed. EUV mask cleaning processes-of-record have been developed and introduced to the industry [1]. The issue is not longer "how to clean the mask" but, "how to keep it clean". With the introduction of EUVL, mask cleanliness extends out beyond the traditional mask cleaning tool. Complete control of contamination and/or particles during transportation, handling and storage will require a holistic approach to mask management. A new environment specifically for EUV mask integrity must be developed and fully tested for the sub 16nm half-pitch node introduction. The SUSS MaskTrack Pro (MTP) InSync was introduced as the solution for EUV mask integrity. SUSS demonstrated the fully automated handling of EUV masks into and out of a Dual Pod System [2]. Intrinsic cleanliness of each individual handling and storage step of the inner pod (EIP) and EUV mask inside the MTP InSync Tool was investigated and reported. A target specification of a PRP <= 0.08 as criterion for the cross contamination between EIP and the EUV reticle during handling within MTP InSync has been achieved and therefore proofing the applicability for the Dual Pod automation. Moreover an appropriate automated handling, other aspects like backside particle contamination and EIP cleanliness plays a significant role to ensure EUV mask integrity. With this concept in mind a system for particle detection has been integrated into MTP InSync. This allows verifying the POR performance for backside cleaning by measuring particles down to 150nm size. A dynamic capture rate of larger 97% at 200nm particle size based on PSLs was achieved; for EIP cleaning, a dry-cleaning technology is under investigation. During feasibility studies high particle removal efficiency (PRE) results larger 99% has been achieved for particles down to 100nm. In this paper, the full scope and roadmap of the MTP InSync will be discussed. Preliminary results of backside particle detection and challenges on EUV Inner Pod (EIP) cleaning will be presented.

  14. Low-cost photomask inspection system

    NASA Astrophysics Data System (ADS)

    Gharpure, Damayanti C.; David, Sunil K.

    1995-12-01

    The competitive demand for increased production rates and tighter quality control in manufacturing integrated circuits requires inspection at higher speeds, finer resolution and at various stages during fabrication, all at an affordable cost. Manual inspection is tedious and entails a degree of concentration that is difficult to maintain over long periods of time. This paper presents a simple, low cost photo mask inspection system based on an IBM compatible PC. Both the reference comparison as well as feature extraction approaches have been implemented for guaranteed defect detection. The defects are further analyzed to obtain details regarding the location, dimension, and type of defect. The system also generates a diagnostic report providing detailed information regarding each defect, that has been detected, for use in on line mask repair. The paper describes configuration of the system along with the image processing algorithms used. The paper also discusses the results obtained, the specifications and over all performance of the system.

  15. Simulating photomask edge roughness and corner rounding

    NASA Astrophysics Data System (ADS)

    Adam, Konstantinos; Socha, Robert J.; Pistor, Thomas V.; Neureuther, Andrew R.

    1997-07-01

    Corner rounding and edge roughness of a rectangular opening at a glass-chrome mask are simulated with TEMPEST. The intensity patterns on the image plane are extracted and compared for these defects at several degrees of fabrication-induced imperfection. A 4X - DUV lithography printing system is assumed with NA equals 0.6 and (sigma) equals 0.5. The prototypical geometry simulate was a 4 micrometers X 1 micrometers line on the mask. The results indicate that the rounding of the corners does not decrease the printed area by more than 2 percent for a 0.4 micrometers radius corner rounding and that roughness should not be a concern, at least in DUV, since it does not crucially affect the linewidth of the printed area.

  16. Japan and Georgia: Economic Partners. For Students in Grade Eight. Instructional Materials about Japan (IMAJ).

    ERIC Educational Resources Information Center

    Haywood, Jane; Morgan, Nancy

    This manual provides suggestions and materials for teaching about Japan. Designed as a supplement to typical textbook treatments, the lessons provide a range of readings, visuals, and activities to enrich and deepen student learning about Japan. Organized around topics dealing with history, geography, government, economics, and culture, the…

  17. [Tuberculosis prevalence survey in Japan].

    PubMed

    Shimao, Tadao

    2009-11-01

    Chest X-ray examination had been used rather soon after the discovery of X-ray by Rontgen K in 1895 as it was possible to detect chest abnormality by simple radiography. After the discovery of radiophotography independently by Abreu M and Koga Y in 1936, it was applied as a method of mass screening for TB in Japan, and Imamura A made a special lecture on "The mass screening for TB" using radiophotography in 1940 in the Annual Meeting of the Japanese Society for TB. From experiences of mass screening, it was found that there were many cases of TB who do not aware of their own disease, and to know the prevalence of TB, the screening of survey subjects by X-ray examination is indispensable. Noticing the importance of mass health examination by chest X-ray, Dr. Tanaka S, then director of information division, JATAHQ, edited a book entitled "How to carry out mass health examination for TB" in 1951, then he moved to the Ministry of Health and Welfare and engaged in the preparation of the first TB prevalence survey. Random sampling technique was already developed, and health center network covering the whole country was already completed in early 1950s. Using these background, the first TB prevalence survey was conducted in 1953. TB Prevalence Survey Committee was organized asking cooperation of experts in TB, epidemiology and statistics, and the survey in sampled area was carried out by a survey team headed by the director of health center in charge of the sampled area. The survey teams engaged in the survey with enthusiasm, and the rate of response to the survey was 99.3%. The result of this survey was published in the WHO Bulletin, 1955. After the survey in 1953, the following prevalence surveys were carried out in 1958, 1963, 1968 and 1973. Outline of these surveys was shown in Table 1, and the rate of examination was high in all, except the survey in 1973. In this year, TB prevalence survey was carried out in conjunction with the national nutritional survey and the

  18. A prospective earthquake forecast experiment for Japan

    NASA Astrophysics Data System (ADS)

    Yokoi, Sayoko; Nanjo, Kazuyoshi; Tsuruoka, Hiroshi; Hirata, Naoshi

    2013-04-01

    One major focus of the current Japanese earthquake prediction research program (2009-2013) is to move toward creating testable earthquake forecast models. For this purpose we started an experiment of forecasting earthquake activity in Japan under the framework of the Collaboratory for the Study of Earthquake Predictability (CSEP) through an international collaboration. We established the CSEP Testing Centre, an infrastructure to encourage researchers to develop testable models for Japan, and to conduct verifiable prospective tests of their model performance. On 1 November in 2009, we started the 1st earthquake forecast testing experiment for the Japan area. We use the unified JMA catalogue compiled by the Japan Meteorological Agency as authorized catalogue. The experiment consists of 12 categories, with 4 testing classes with different time spans (1 day, 3 months, 1 year, and 3 years) and 3 testing regions called All Japan, Mainland, and Kanto. A total of 91 models were submitted to CSEP-Japan, and are evaluated with the CSEP official suite of tests about forecast performance. In this presentation, we show the results of the experiment of the 3-month testing class for 5 rounds. HIST-ETAS7pa, MARFS and RI10K models corresponding to the All Japan, Mainland and Kanto regions showed the best score based on the total log-likelihood. It is also clarified that time dependency of model parameters is no effective factor to pass the CSEP consistency tests for the 3-month testing class in all regions. Especially, spatial distribution in the All Japan region was too difficult to pass consistency test due to multiple events at a bin. Number of target events for a round in the Mainland region tended to be smaller than model's expectation during all rounds, which resulted in rejections of consistency test because of overestimation. In the Kanto region, pass ratios of consistency tests in each model showed more than 80%, which was associated with good balanced forecasting of event

  19. Cenozoic rift tectonics of the Japan Sea

    SciTech Connect

    Kimura, K.

    1988-08-01

    The Japan Sea is one of the back-arc basins in trench-arc systems bordering the western Pacific. Recent paleomagnetic works suggest the Japan Sea opened during early to middle Miocene. Radiometric and microfossil ages of the Cenozoic onland sequences in the Japanese Islands elucidate the rift tectonics of the Japan Sea. The rifting history is summarized as follows: nonmarine volcanic formations of prerift stage before 50 Ma, rift-onset unconformity at 40 Ma, nonmarine volcanic formations of synrift stage 20-33 Ma, breakup unconformity 19 Ma showing the opening of the Japan Sea, marine volcanic and sedimentary formations of synrift stage 14.5-18 Ma, beginning of regional subsidence 14.5 Ma corresponding to the end of the Japan Sea opening, marine sedimentary formations of postdrift stage after 14.5 Ma. Rifting is not limited to the synrift stage but is continued to the syndrift stage. Rifting led to a horst-and-graben structure. Thus, the Cenozoic onland sequences in the Japanese Islands are suited for a study of rift tectonics because the sequences were subaerially exposed by the late Miocene-Holocene island-arc tectonics. Rift tectonics cannot be studied as easily in most Atlantic-type passive margins.

  20. Early psychosis in Asia: Insights from Japan.

    PubMed

    Mizuno, Masafumi; Nemoto, Takahiro; Tsujino, Naohisa; Funatogawa, Tomoyuki; Takeshi, Kiyoaki

    2012-03-01

    The largest task for psychiatry in Japan today is the deinstitutionalization of patients with psychiatric disorders. In Japan, all citizens are covered by a national health plan, and about 70% of the total cost is covered by the national health insurance scheme. At present, however, there is still no category for early intervention in the national health reimbursement schedule. Recent research has shown that the mean duration of untreated psychosis (DUP) at seven university hospitals in Japan was 17.6 months. We present data using case vignettes suggesting that pharmacotherapy might be overused in prodromal cases. The concept of an At-Risk Mental State (ARMS)/prodromal state might not yet be widely recognized among Japanese psychiatrists. We outline early intervention initiatives in Japan; The Japanese Society for Prevention and Early Intervention in Psychiatry (JSEIP), and a representative early intervention facility for young people is the "Il Bosco" in Tokyo. There are several leading centers for early intervention research and practice in Japan. Most of them are driven by university departments of psychiatry with respect to both research and clinical activities. The development of services for early intervention is expected to reduce stigmatization, prevent suicide among young persons, and promote general knowledge about mental health. There are several common or similar issues among Asian countries, including service systems, community attitudes to psychiatric illness including stigma, and dependence on pharmacotherapy. PMID:26878953

  1. Population support a priority for Japan.

    PubMed

    1991-05-01

    The Japanese government has approved an increase in both financial and technical assistance for family planning in developing countries for FY1991. Japan's contribution to the United National Population FUnd (UNFPA) will total US$56.8 million, a 1.83% increase from the previous year, and it will be the largest donation by any country. Japanese support of UNFPA has skyrocketed from an initial contribution of US$1.5 million to today's level. Besides its multilateral assistance through UNFPA, the country will also provide bilateral technical assistance through the Japan International Cooperation Agency (JICA). Increasing by 7.8% from 1990, technical assistance will total US$8.54 million, and it will go to the following countries: Colombia, Egypt, Indonesia, Kenya, Mexico, Nepal, Peru, the Philippines, Sri Lanka, and Turkey. Japan will provide the equipment and supplies needed for transferring technical expertise from Japanese experts to personnel from the recipient countries. Japan will also host an international family planning seminar for developing countries. Japan's pledge of assistance reflects the country's desire to improve the social conditions and quality of life for people living in developing countries, and it indicated the growing awareness of the Japanese public concerning population and family planning issues. PMID:12283975

  2. The economics of pollution control in Japan

    SciTech Connect

    Corwin, T.K.

    1980-02-01

    The Japanese approach to pollution control expenditures is based on the polluter-pays principle, an economic concept introduced by OECD in 1972. Under the PPP, costs are borne by the polluter rather than by the government. Costs are then passed on to the consumer in increased prices. Japan has extended the original PPP to include payment for restoration of polluted environments, administration of monitoring and surveillance programs, and compensation for victims of pollution. The total investment for pollution control by industry in Japan during 1965-75 is reported. Available data indicate that the high costs of pollution control have not caused a major shock to Japan's economic growth. (1 drawing, 3 graphs, 5 references, 1 table)

  3. Patients' rights in Japan: progress and resistance.

    PubMed

    Morikawa, I

    1994-12-01

    The discussion of patients' rights in Japan began in 1968 when a surgeon was accused of violating a potential organ donor's right to life by arbitrarily employing brain-based criteria in the determination of his death. A proliferation of documents that articulate and endorse patients' rights occurred in the 1980s and early 1990s. The doctrine of informed consent, which has been a central aspect of the movement toward patients' rights, is increasingly recognized in Japan, although importance rarely has been attached to the element of the patient's "appreciation" of the information disclosed by the physician, much less to the "voluntariness" of the patient's decision. Nevertheless, recent court decisions indicate progress both in the acceptance and the understanding of the doctrine in Japan. PMID:10138752

  4. Genetic background of hyperphenylalaninemia in Nagasaki, Japan.

    PubMed

    Dateki, Sumito; Watanabe, Satoshi; Nakatomi, Akiko; Kinoshita, Eiichi; Matsumoto, Tadashi; Yoshiura, Koh-Ichiro; Moriuchi, Hiroyuki

    2016-05-01

    Phenylketonuria (PKU) and related hyperphenylalaninemia (HPA) are caused by a deficiency in hepatic phenylalanine hydroxylase (PAH). The incidence of PKU in Nagasaki prefecture is higher than that in all parts of Japan (1/15 894 vs 1/120 000). To investigate the genetic background of patients with HPA in Nagasaki prefecture, mutation analysis was done in 14 patients with PKU or mild HPA. Homozygous or compound heterozygous PAH mutations were identified in all the patients. The spectrum of PAH mutations in the cohort was broad and similar to those in all parts of Japan and East Asian countries. R53H is the most common mutation in patients with mild HPA. The present results provide further support for genotype-phenotype correlations in patients with HPA. The high incidence of PKU in Nagasaki, the westernmost part of Japan, might be due to migration of people with PAH mutations from China and Korea, and geographic factors. PMID:27173423

  5. Insights into software development in Japan

    NASA Technical Reports Server (NTRS)

    Duvall, Lorraine M.

    1992-01-01

    The interdependence of the U.S.-Japanese economies makes it imperative that we in the United States understand how business and technology developments take place in Japan. We can gain insight into these developments in software engineering by studying the context in which Japanese software is developed, the practices that are used, the problems encountered, the setting surrounding these problems, and the resolution of these problems. Context includes the technological and sociological characteristics of the software development environment, the software processes applied, personnel involved in the development process, and the corporate and social culture surrounding the development. Presented in this paper is a summary of results of a study that addresses these issues. Data for this study was collected during a three month visit to Japan where the author interviewed 20 software managers representing nine companies involved in developing software in Japan. These data are compared to similar data from the United States in which 12 managers from five companies were interviewed.

  6. Toward freedom from cancer pain in Japan.

    PubMed

    Otsuka, Kuniko; Yasuhara, Hajime

    2007-01-01

    Life expectancy in Japan is highest in the world. Cancer is the leading cause of mortality in Japan, accounting for about 30 percent of all deaths. Many Japanese cancer patients experience severe pain although they and their families hope to be pain free at the end of their lives. Toward that end, the consumption of morphine in Japan has increased markedly since 1989. The amount of morphine hydrochloride and morphine sulfate consumed in 2001 was 6.1 times that used in Japan in 1989. However, the amount of morphine consumed in Japan is still less than in other developed nations, and was only one-sixth of the amount used in Australia in 2001. As a result, many Japanese cancer patients experience potentially manageable cancer pain, largely because the amount of the drug used by doctors is insufficient for pain control. An increasing number of Japanese doctors now understand that their patients' quality of life is most important in end-of-life care and how to use the three step analgesic ladder of the World Health Organization (WHO). However, other doctors do not understand these issues sufficiently causing some patients to die without good pain control. Both the general population and some medical professionals misunderstand and have prejudice against the use of morphine. Patients often do not participate in decision making about medical treatment because of remaining paternalism in the relationship between Japanese doctors and patients. Thus, cancer pain management in Japan is not as effective as it can be and not all Japanese cancer patients receive appropriate management for their cancer pain. To improve outcomes for Japanese patients, it is necessary for health professional and social work students and practicing professionals to receive contemporary education including an introduction to palliative care and ethics. PMID:18032354

  7. The emperor of Japan and the aurora

    NASA Astrophysics Data System (ADS)

    Akasofu, S. I.

    On October 3, 1985, I gave a special lecture on the aurora for the Emperor of Japan in his palace in Tokyo. It seems the Emperor, a marine biologist, has an unusual interest in the aurora. After my slide presentation, he asked how we confirm ancient sighting reports of the aurora in Japan. He was not satisfied with my response that anomalous events in the sky were well documented in an ancient publication entitled Japanese Meteorological Data and asked further how one could confirm such sightings as auroral events. He was visibly pleased to learn that the dates of these sightings coincided with those recorded elsewhere in the world.

  8. Tobacco control: recent movements in Japan.

    PubMed

    Asukai, Yumiko; Torii, Yoichi; Chikamoto, Yosuke

    2005-01-01

    Tobacco control in Japan has not kept pace with the rest of the global community in the past several decades. Although recent movements in Japan suggest that some changes will occur, most of the initiatives are still circumspect at best. The motivations driving most of these changes come from concern for morals about obeying the law and propriety of consideration for nonsmokers in public places, rather than for health. Moreover, the complicated relationship between the government and the tobacco industry, as well as between the two ministries that oversee the industry, may act as obstacles to any real comprehensive tobacco control. PMID:15675541

  9. Introductory Overview of Stone Heritages in Japan

    NASA Astrophysics Data System (ADS)

    Kato, Hirokazu; Oikawa, Teruki; Fujita, Masayo; Yokoyama, Shunji

    2013-04-01

    As one contribution to 'Global Heritage Stone Resources' (GHSR), some stone heritages in Japan, which are nominated in the interim list, are briefly introduced. The geology of Japanese Islands where are the one of the most active areas in the history of the Earth, is very complicated. Therefore Japanese Islands consist of various kinds of minerals and rocks. Some of them were used to make stone implements and accessories. Japanese people also used to the best possible advantage to built tombstone, gate, pavement ,and the basement and wall of the large building such as temples, shrines, castles and modern buildings. 1. Stone Heritages of Pre-historical age: In the late Pleistocene and the early Holocene, ancient Japanese used obsidian cooled rapidly from rhyolitic magma.to make small implements and accessories. For example, Shirataki, Hokkaido (north island) is the largest place producing obsidian in Japan where Paleolithic people made arrowhead, knives and so on. Another example, Jade yielded in Itoigawa City, Japan Sea coast of central Japan, was made in the metamorphic rock about five hundred million years ago. Itoigawa area is only one place where jade is abundantly produced in Japan. Ancient people had been already collected and processed to ornaments although it is very hard and traded in wide area more than several thousand years ago. 2. Stone Heritages of Historical age: 2.1 Archaeological remains: In the Kofun (old mound) period (250 to 538 AD), stone burial chambers were used for old mounds to preserve against the putrefaction and to protect from the theft. For example, Ishibutai Kofun ("ishi" means "stone" and "butai" means "stage") in Nara old capital city, southwest Japan, is the largest known megalithic structure made of granite in Japan. 2.2 Stone walls of some typical castles Stones used is because of not only the rich reserves of rocks but also restriction of transportation. Osaka (second biggest city) castle, are composed of Cretaceous granite

  10. Recycling scheme for scrapped automobiles in Japan

    SciTech Connect

    Suzuki, Masao; Nakajima, Akira; Taya, Sadao

    1995-12-31

    Over 5 million cars are scrapped yearly in Japan. After dismantling scrapped automobiles, they are put into a shredder for differential recovery of ferrous and nonferrous metals. The residue, which is called shredder dust, runs over 1.2 million tons per year. This paper reports a entire sequence of scrapping cars in Japan with the following sections: (1) production and scrapped car management, (2) material composition, (3) dismantling, (4) shredder plant, (5) differential recovery of metals including specific gravity and newly developed color separation.

  11. JPRS report: Science and technology, Japan, [June 19, 1987

    SciTech Connect

    1987-06-19

    This report contains information concerning Japan`s science and technology. Specific topics include: (1) advanced materials, (2) aerospace and civil aviation, (3) energy, (4) nuclear developments, and (5) transportation.

  12. JPRS report: Science and technology, Japan, [June 4, 1987

    SciTech Connect

    1987-06-04

    This report contains information concerning Japan`s science and technology. Specific topics include: (1) advanced materials, (2) aerospace, civil aviation, (3) defense industries, (4) energy, (5) lasers, sensors, optics, (6) nuclear developments, and (7) transportation.

  13. JPRS report: Science and technology, Japan, [October 20, 1989

    SciTech Connect

    1989-10-20

    This report contains information concerning Japan`s science and technology. The following topics are addressed: (1) aerospace, civil aviation, (2) biotechnology, (3) energy, (4) microelectronics, (5) nuclear engineering, and (6) superconductivity.

  14. 77 FR 64487 - Renewable Energy Policy Business Roundtable in Japan

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-10-22

    ... International Trade Administration Renewable Energy Policy Business Roundtable in Japan AGENCY: International... Commerce's International Trade Administration (ITA) is coordinating a Renewable Energy Policy Business... regulatory landscape for renewable energy developing in Japan at this time. Following the Roundtable,...

  15. Teaching about Japan through Modern Literature.

    ERIC Educational Resources Information Center

    von Loewenfeldt, Charles; And Others

    1981-01-01

    Suggests ways in which a firsthand knowledge about Japan can be brought into American secondary school classrooms through the study of various forms of modern literature. Each example of Japanese literature (short stories, novels, poetry, comics, etc.) is followed by questions for student discussion. (DB)

  16. Family Psychology and Family Therapy in Japan.

    ERIC Educational Resources Information Center

    Kameguchi, Kenji; Murphy-Shigematsu, Stephen

    2001-01-01

    Reviews the development of family psychology and family therapy in Japan, tracing the origins of these movements, explaining how these fields were activated by the problem of school refusal, and describing an approach to family therapy that has been developed to work with families confronting this problem, as well as preventive programs of family…

  17. Japan Sets the Pace in Educational Television.

    ERIC Educational Resources Information Center

    Tiene, Drew

    1983-01-01

    The Ministry of Education and the Japanese Broadcasting Corporation (NHK) public television network are responsible for the instructional broadcasting that has penetrated Japan's classrooms at all levels. Implications for American television include stronger federal support for public television and the possible development of a national…

  18. Child Development and Childcare in Japan

    ERIC Educational Resources Information Center

    Anme, Tokie; Segal, Uma A.

    2010-01-01

    With increasing numbers of women joining the workforce, there is a need for quality childcare. This project, conducted in Japan and using a large number of participants, sought to standardize an evaluation scale to measure the development of children. The development of children under six years of age (N = 22,819) who are enrolled in childcare…

  19. Ideas for Teaching about Japan in Preschools.

    ERIC Educational Resources Information Center

    Lokon, Elizabeth

    This curriculum unit consists of a series of lesson plans focused on Japan for preschool students ages 3 to 5 years. The unit has five themes: (1) geography; (2) language; (3) people and clothing; (4) customs; and (5) food. Each theme has from four to eight activity lessons which address different developmental domains, including language, social…

  20. Kiyo Journals and Scholarly Communication in Japan

    ERIC Educational Resources Information Center

    Kamada, Hitoshi

    2007-01-01

    Kiyo are journals published by Japanese academic institutions. As a scholarly communication medium, they have inherent problems such as limited accessibility and lack of quality control. Despite these problems, they have evolved to comprise the majority of academic journals published in the humanities and social sciences in Japan because they fit…

  1. Living in Japan. Intercultural Exchange Series. Revised.

    ERIC Educational Resources Information Center

    Hawkinson, Annie

    The guide provides a brief introduction to the culture and language of Japan, and is designed for visitors, students, and business travelers. It offers practical information on various aspects of daily living, including: money; banks; food; restaurants; hotels; tipping; postal and telecommunications services; transportation; shopping; health and…

  2. Basic Skills in Asian Studies: Japan.

    ERIC Educational Resources Information Center

    Hantula, James

    This publication contains 20 learning activities for developing basic skills while teaching about Japan at the secondary level. The activities are self-contained and each consists of a short description, followed by a five-item true or false test and five open-ended questions for student practice. The learning activities are followed by a…

  3. Japanese encephalitis virus in meningitis patients, Japan.

    PubMed

    Kuwayama, Masaru; Ito, Mikako; Takao, Shinichi; Shimazu, Yukie; Fukuda, Shinji; Miyazaki, Kazuo; Kurane, Ichiro; Takasaki, Tomohiko

    2005-03-01

    Cerebrospinal fluid specimens from 57 patients diagnosed with meningitis were tested for Japanese encephalitis virus. Total RNA was extracted from the specimens and amplified. Two products had highest homology with Nakayama strain and 2 with Ishikawa strain. Results suggest that Japanese encephalitis virus causes some aseptic meningitis in Japan. PMID:15757569

  4. Current Educational Technology Research Trends in Japan

    ERIC Educational Resources Information Center

    Nakayama, Minoru; Ueno, Maomi

    2009-01-01

    To examine trends in educational practice research, this article conducted a survey and analysis of factors affecting the review of research papers in the field of the educational technology in Japan. Two factors, namely, practical orientation and theoretical orientation, were extracted from 63 survey responses, and scores from members of a…

  5. Behavioural Strategies of Teachers in Japan

    ERIC Educational Resources Information Center

    Paisey, Alan; Kobayashi, Hiromi; Li, Jian

    2007-01-01

    This article explores the behavioural strategies adopted by a sample of teachers in Japan. The data for the study came from a total of 298 Japanese students who were invited to evaluate teacher behaviour by using the Student's Teacher Evaluation Questionnaire. The sixteen-item questionnaire was adopted from Paisey (1975), who had conducted similar…

  6. Teaching about Japan. ERIC Digest No. 38.

    ERIC Educational Resources Information Center

    Wojtan, Linda S.

    This is an age of ascendency of the Pacific Rim area, especially the Asian sector. Recent decades have seen unprecedented economic growth throughout this area. By examining Japan, the region's pre-eminent nation and harbinger of future developments, the larger topic of the Pacific Rim can be explored. It is particularly important to teach about…

  7. Star Week- A Successful Campaign in Japan -

    NASA Astrophysics Data System (ADS)

    Watanabe, J.

    2006-08-01

    In 1995, we started a campaign of the star week as between August 1 and 7 when it is usually expected that most part of Japan should be good weather after the rainy season during the summer holiday. Several hundreds of astronomical facilities for general public in Japan, including planetariums, museums, and public observatories participated in our campaign, together with make good collaborations for education purpose. More than 200 astronomical events such as star parties were coordinated for general public every year. Japan is one of the worst countries for light pollution. Especially most of children have no experience of seeing Milky Way. Let them see the real stars. Let them feel the universe by inviting them to the related astronomical facilities located all over Japan. For realizing this purpose, it is better to set the special week, similar to the "Bird Week" by arranging various astronomical events in these facilities in order to invite all the general public. This is the motivation of the beginning of the star week. Such outreach program should give opportunity for general public to understand the excitement of the astronomy. In this paper, we will introduce present situation of our campaign, along with some statistics.

  8. Trends in Research on Japan's Educational Broadcasts.

    ERIC Educational Resources Information Center

    Akiyama, Takashiro

    This overview of Japanese research on educational television and media education from the mid-1970s through 1985 begins by presenting a brief history of educational broadcasting and recent trends in broadcasting and related research in Japan. The following areas are reviewed: (1) research using program analysis; (2) research using test production…

  9. Teacher Cognition in Corrective Feedback in Japan

    ERIC Educational Resources Information Center

    Mori, Reiko

    2011-01-01

    Based on qualitative data, the current study explored how the knowledge and beliefs of two EFL professionals shaped their corrective feedback practices. The two teachers teaching in Japan had in common two main agendas that they kept in mind as they provided or opted not to provide corrective feedback. They aimed to teach the language and to…

  10. ICT Implementation and Online Learning in Japan.

    ERIC Educational Resources Information Center

    Fujitani, Satoru; Bhattacharya, Madhumita; Akahori, Kanji

    2003-01-01

    Addresses issues related to the implementation of information and communications technology (ICT) in education and online learning with particular reference to Japan. Presents an integrated model for the introduction of ICT at all levels of education that suggests ways of bridging the gap between research and development and actual educational…