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Sample records for pvd dual magnetron

  1. Control of particle flux and energy on substrate in an inverted cylindrical magnetron for plasma PVD

    NASA Astrophysics Data System (ADS)

    Todoran, A.; Mantel, M.; Bés, A.; Vachey, C.; Lacoste, A.

    2014-12-01

    Inverted cylindrical magnetrons (ICMs) are often used in dc, pulsed dc or mid-frequency ac mode for coating complex objects with thin films deposited by plasma PVD. Since in such a configuration the substrate is inherently surrounded by the target and hence by the plasma, the energy flux of the impinging particles represents the main contribution to the substrate heating. This can readily constitute a limiting factor in the deposition process, especially when it is not possible to cool and bias the substrate. This work concerns a dc-driven ICM configuration subjected to several constraints: not only is the substrate surface area small by comparison to the cathode surface area, but its imposed potential is the ground one, thus itself constituting the anode surface of the considered setup. Several important substrate heating factors are highlighted and, in order to reduce the most prominent of them, a means to raise the plasma potential is proposed. This is achieved by positively polarizing two additional electrodes with respect to the ground. This additional surface generates a redistribution of the current and consequently regulates the electron flux on the substrate. The results are shown as a function of bias applied on the auxiliary electrodes and discussed in terms of the impact on the substrate heating.

  2. Preparation of a-SiC:H/a-GeC:H superlattices by dual magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Saito, N.; Yamaguchi, T.

    1989-10-01

    Amorphous semiconductor superlattices composed of hydrogenated amorphous silicon carbon alloys and germanium carbon alloys have been prepared by a dual magnetron sputtering method. A small-angle x-ray diffraction measurement has indicated that the superlattices consist of well-defined smooth layers. Optical band gap has been examined for a series of samples; the thickness of the germanium carbon layer was changed from 20 to 130 Å, while the thickness of the silicon carbon layer was kept constant at 60 Å. The optical band gap increases upon decreasing the thickness of the germanium carbon layer, indicating quantum size effects due to the formation of superlattice structures.

  3. Effects of an unbalanced magnetron in a unique dual-cathode, high rate reactive sputtering system

    NASA Technical Reports Server (NTRS)

    Rohde, S. L.; Petrov, I.; Sproul, W. D.; Barnett, S. A.; Rudnik, P. J.; Graham, M. E.

    1990-01-01

    Simple plasma and magnetic field measurements are presented to illustrate the opportunities afforded by using unbalanced magnetrons in a dual-cathode system. The system employs a pair of opposed cathodes, 38 cm x 13 cm, placed 27.5 cm apart, to coat specimens mounted on a rotational substrate holder. Comparisons are drawn between the original 'balanced' magnetron and several unbalanced configurations in terms of field strengths, deposition rates, etching characteristics, and substrate ion current densities for the growth of TiN films. The effects of 'unbalancing' on the nature of the plasma within the 3D geometry of the deposition chamber are elucidated via plasma probe and magnetic field studies performed under a variety of conditions. All the unbalanced configurations examined provided enhanced ion bombardment at the surface of the growing film. The closed-field or opposed magnet geometry resulted in a threefold or greater increase in current density when compared with that obtained using the corresponding mirrored geometry under the same conditions.

  4. Development of Dual-Frequency Gyrotron with Triode Magnetron Injection Gun

    NASA Astrophysics Data System (ADS)

    Kajiwara, Ken; Oda, Yasuhisa; Kasugai, Atsushi; Takahashi, Koji; Sakamoto, Keishi

    2011-12-01

    A high power dual-frequency gyrotron is designed and tested. The design is based on a 170 GHz single-frequency gyrotron with a triode magnetron injection gun (MIG). The triode MIG enables to choose variety of oscillation modes for different frequencies with suitable pitch factor, which is the great advantage for a multi-frequency gyrotron. Another frequency of 137 GHz is selected in order to use a 1.853-mm-thick single-disk output window. Cavity modes are TE31,11 and TE25,9 for 170 and 137 GHz, respectively, which have high mode conversion efficiency to the RF beam mode with similar radiation angles. In short-pulse experiments, the maximum power of more than 1.3 MW is achieved with high-efficiency for both frequencies.

  5. Control of ions energy distribution in dual-frequency magnetron sputtering discharges

    SciTech Connect

    Ye, Chao He, Haijie; Huang, Fupei; Liu, Yi; Wang, Xiangying

    2014-04-15

    The ion energy distributions (IEDs) in the dual-frequency magnetron sputtering discharges were investigated by retarding field energy analyzer. Increasing power ratio of 2 MHz to 13.56 (27.12 or 60) MHz led to the evolution of IEDs from a uni-modal distribution towards a uni-modal distribution with high-energy peak shoulder and a bi-modal distribution. While increasing power ratio of 13.56 MHz to 27.12 MHz and 27.12 MHz to 60 MHz, led to the increase of peak energy. The evolution of IEDs shape and the increase of peak energy are due to the change of ions responding to the average field of high-frequency period towards the instantaneous sheath potential of low-frequency period.

  6. Physical properties of erbium implanted tungsten oxide filmsdeposited by reactive dual magnetron sputtering

    SciTech Connect

    Mohamed, Sodky H.; Anders, Andre

    2006-11-08

    Amorphous and partially crystalline WO3 thin films wereprepared by reactive dual magnetron sputtering and successively implantedby erbium ions with a fluence in the range from 7.7 x 1014 to 5 x 1015ions/cm2. The electrical and optical properties were studied as afunction of the film deposition parameters and the ion fluence. Ionimplantation caused a strong decrease of the resistivity, a moderatedecrease of the index of refraction and a moderate increase of theextinction coefficient in the visible and near infrared, while theoptical band gap remained almost unchanged. These effects could belargely ascribed to ion-induced oxygen deficiency. When annealed in air,the already low resistivities of the implanted samples decreased furtherup to 70oC, whereas oxidation, and hence a strong increase of theresistivity, was observed at higher annealing temperatures.

  7. Effect of ion bombarding energies on photocatalytic TiO{sub 2} films growing in a pulsed dual magnetron discharge

    SciTech Connect

    Novak, Ondrej; Vlcek, Jaroslav

    2011-05-15

    Photocatalytic crystalline TiO{sub 2} films were deposited by a pulsed dc dual magnetron system. The depositions were performed using two unbalanced magnetrons with planar titanium targets of 50 mm diameter in Ar+O{sub 2} gas mixtures at a total pressure of 0.9 Pa with oxygen partial pressures ranging from 0.2 to 0.9 Pa. The maximum substrate surface temperature was 160 deg. C Both magnetrons operated in the same asymmetric bipolar mode at the repetition frequencies of 100 and 350 kHz with a fixed 50% duty cycle and the average target power densities of 52-74 W cm{sup -2} in the negative voltage phase of the pulses, but the magnetron operations were shifted by a half of the period. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. The measured structure of the ion energy distributions was correlated with the distinct pulse phases of the magnetron discharges. A decrease in the energy delivered by fast ions (E{>=}10 eV) to the unit volume of the growing films, together with possible effects of plasma-chemical processes, during the depositions at the oxygen partial pressures of 0.5-0.75 Pa and the repetition frequency of 350 kHz resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO{sub 2} films.

  8. Structural, optical and electrical properties of WOxNy filmsdeposited by reactive dual magnetron sputtering

    SciTech Connect

    Mohamed, Sodky H.; Anders, Andre

    2006-06-05

    Thin films of tungsten oxynitride were prepared by dual magnetron sputtering of tungsten using argon/oxygen/nitrogen gas mixtures with various nitrogen/oxygen ratios. The presence of even small amounts of oxygen had a great effect not only on the composition but on the structure of WOxNy films, as shown by Rutherford backscattering and x-ray diffraction, respectively. Significant incorporation of nitrogen occurred only when the nitrogen partial pressure exceeded 89 percent of the total reactive gas pressure. Sharp changes in the stoichiometry, deposition rate, room temperature resistivity, electrical activation energy and optical band gap were observed when the nitrogen/oxygen ratio was high.The deposition rate increased from 0.31 to 0.89 nm/s, the room temperature resistivity decreased from 1.65 x 108 to 1.82 x 10-2 ?cm, the electrical activation energy decreased from 0.97 to 0.067 eV, and the optical band gap decreased from 3.19 to 2.94 eV upon nitrogen incorporation into the films. WOxNy films were highly transparent as long as the nitrogen incorporation was low, and were brownish (absorbing) and partially reflecting as nitrogen incorporation became significant.

  9. Sputter deposition of MgxAlyOz thin films in a dual-magnetron device: a multi-species Monte Carlo model

    NASA Astrophysics Data System (ADS)

    Yusupov, M.; Saraiva, M.; Depla, D.; Bogaerts, A.

    2012-07-01

    A multi-species Monte Carlo (MC) model, combined with an analytical surface model, has been developed in order to investigate the general plasma processes occurring during the sputter deposition of complex oxide films in a dual-magnetron sputter deposition system. The important plasma species, such as electrons, Ar+ ions, fast Ar atoms and sputtered metal atoms (i.e. Mg and Al atoms) are described with the so-called multi-species MC model, whereas the deposition of MgxAlyOz films is treated by an analytical surface model. Target-substrate distances for both magnetrons in the dual-magnetron setup are varied for the purpose of growing stoichiometric complex oxide thin films. The metal atoms are sputtered from pure metallic targets, whereas the oxygen flux is only directed toward the substrate and is high enough to obtain fully oxidized thin films but low enough to avoid target poisoning. The calculations correspond to typical experimental conditions applied to grow these complex oxide films. In this paper, some calculation results are shown, such as the densities of various plasma species, their fluxes toward the targets and substrate, the deposition rates, as well as the film stoichiometry. Moreover, some results of the combined model are compared with experimental observations. Note that this is the first complete model, which can be applied for large and complicated magnetron reactor geometries, such as dual-magnetron configurations. With this model, we are able to describe all important plasma species as well as the deposition process. It can also be used to predict film stoichiometries of complex oxide films on the substrate.

  10. Effect of hafnium doping on density of states in dual-target magnetron co-sputtering HfZnSnO thin film transistors

    SciTech Connect

    Huang, Chuan-Xin; Li, Jun Fu, Yi-Zhou; Jiang, Xue-Yin; Zhang, Jian-Hua; Zhang, Zhi-Lin

    2015-11-23

    This study investigates the effect of hafnium doping on the density of states (DOSs) in HfZnSnO thin film transistors fabricated by dual-target magnetron co-sputtering system. The DOSs is extracted by temperature-dependent field-effect measurements, and they decrease from 1.1 × 10{sup 17} to 4.6 × 10{sup 16 }eV/cm{sup 3} with increasing the hafnium concentrations. The behavior of DOSs for the increasing hafnium concentration HfZnSnO thin film transistors can be confirmed by both the reduction of ΔV{sub T} under bias stress and the trapping charges calculated by capacitance voltage measurements. It suggests that the reduction in DOSs due to the hafnium doping is closely related with the bias stability and thermal stability.

  11. Parameter tuning of PVD process based on artificial intelligence technique

    NASA Astrophysics Data System (ADS)

    Norlina, M. S.; Diyana, M. S. Nor; Mazidah, P.; Rusop, M.

    2016-07-01

    In this study, an artificial intelligence technique is proposed to be implemented in the parameter tuning of a PVD process. Due to its previous adaptation in similar optimization problems, genetic algorithm (GA) is selected to optimize the parameter tuning of the RF magnetron sputtering process. The most optimized parameter combination obtained from GA's optimization result is expected to produce the desirable zinc oxide (ZnO) thin film from the sputtering process. The parameters involved in this study were RF power, deposition time and substrate temperature. The algorithm was tested to optimize the 25 datasets of parameter combinations. The results from the computational experiment were then compared with the actual result from the laboratory experiment. Based on the comparison, GA had shown that the algorithm was reliable to optimize the parameter combination before the parameter tuning could be done to the RF magnetron sputtering machine. In order to verify the result of GA, the algorithm was also been compared to other well known optimization algorithms, which were, particle swarm optimization (PSO) and gravitational search algorithm (GSA). The results had shown that GA was reliable in solving this RF magnetron sputtering process parameter tuning problem. GA had shown better accuracy in the optimization based on the fitness evaluation.

  12. Optical constants of silicon carbide deposited with emerging PVD techniques

    NASA Astrophysics Data System (ADS)

    Monaco, Gianni; Suman, M.; Pelizzo, M. G.; Nicolosi, P.

    2009-05-01

    Silicon carbide (SiC) is an attractive material for EUV and soft X-ray optics. CVD-deposited silicon carbide (deposited at 1400° C on Si substrate) is the best reflective material in the whole EUV interval (with about the 48% of reflectance at 121.6 nm). Despite of this, SiC thin films deposited with PVD techniques, such as magnetron sputtering, on silicon substrate, do not have the same performances and they undergo to a degradation with time, probably because of some stoichiometry reason (carbon rich). Depositing stable SiC with PVD techniques is crucial in building ML's, like Si/SiC and SiC/Mg for soft X-ray applications (such space telescope and photolithography). We deposited some preliminary samples using the Pulsed Laser Deposition (PLD) and the Pulsed Electron Deposition (PED) techniques achieving a good reflectance in the whole EUV range (27% at near normal incidence at 121.6 nn) on a silicon substrate. The higher energy involved in these deposition processes could lead to a film with a stoichiometry much closer to the target one. The reflectivity of the deposited films has been measured at the BEAR beamline of the ELETTRA synchrotron in Trieste (Italy; the optical constants retrieved at six wavelength from 121.6 nm down to 5 nm.

  13. Characterisation of Mg biodegradable stents produced by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Elmrabet, N.; Botterill, N.; Grant, D. M.; Brown, P. D.

    2015-10-01

    Novel Mg-minitubes for biodegradable stent applications have been produced using PVD magnetron sputtering. The minitubes were characterised, as a function of annealing temperature, using a combination of SEM/EDS, XRD and hardness testing. The as-deposited minitubes exhibited columnar grain structures with high levels of porosity. Slight alteration to the crystal structure from columnar to equiaxed grain growth was demonstrated at elevated temperature, along with increased material densification, hardness and corrosion resistance.

  14. Lutetium Oxide Coatings by PVD

    PubMed Central

    Topping, Stephen G; Park, CH; Rangan, SK; Sarin, VK

    2009-01-01

    Due to its high density and cubic structure, Lutetium oxide (Lu2O3) has been extensively researched for scintillating applications. Present manufacturing methods, such as hot pressing and sintering, do not provide adequate resolution due to light scattering of polycrystalline materials. Vapor deposition has been investigated as an alternative manufacturing method. Lutetium oxide transparent optical coatings by magnetron sputtering offer a means of tailoring the coating for optimum scintillation and resolution. Sputter deposited coatings typically have inherent stress and defects that adversely affect transparency and emission. The effect of process parameters on the coating properties is being investigated via x-ray diffraction (XRD), scanning electron microscopy (SEM) and emission spectroscopy, and will be presented and discussed. PMID:20390046

  15. ION MAGNETRON

    DOEpatents

    Gow, J.D.; Layman, R.W.

    1962-10-31

    A magnetohydrodynamic device or plasma generator of the ion magnetron class is described wherein a long central electrode is disposed along the axis of an evacuated cylinder. A radial electric field and an axial magnetic field are provided between the cylsnder and the electrode, forming a plasma trapping and heating region. For maximum effectiveness, neutral particles from the cylinder wall must be prevented from entering such region This is effected by forming a cylindrical sheath of electrons near the cylinder wall for ionizing undesired neutral particles, which are then trapped and removed by the magnetic field. An annular filament at one end of the device provides the electrons, which follow the axial magnetic field to a reflecting electrode at the opposite end of the device. (AEC)

  16. Membrane-association determinants of the omega-amino acid monooxygenase PvdA, a pyoverdine biosynthetic enzyme from Pseudomonas aeruginosa.

    PubMed

    Imperi, Francesco; Putignani, Lorenza; Tiburzi, Federica; Ambrosi, Cecilia; Cipollone, Rita; Ascenzi, Paolo; Visca, Paolo

    2008-09-01

    The L-ornithine N(delta)-oxygenase PvdA catalyses the N(delta)-hydroxylation of L-ornithine in many Pseudomonas spp., and thus provides an essential enzymic function in the biogenesis of the pyoverdine siderophore. Here, we report a detailed analysis of the membrane topology of the PvdA enzyme from the bacterial pathogen Pseudomonas aeruginosa. Membrane topogenic determinants of PvdA were identified by computational analysis, and verified in Escherichia coli by constructing a series of translational fusions between PvdA and the PhoA (alkaline phosphatase) reporter enzyme. The inferred topological model resembled a eukaryotic reverse signal-anchor (type III) protein, with a single N-terminal domain anchored to the inner membrane, and the bulk of the protein spanning the cytosol. According to this model, the predicted transmembrane region should overlap the putative FAD-binding site. Cell fractionation and proteinase K accessibility experiments in P. aeruginosa confirmed the membrane-bound nature of PvdA, but excluded the transmembrane topology of its N-terminal hydrophobic region. Mutational analysis of PvdA, and complementation assays in a P. aeruginosa DeltapvdA mutant, demonstrated the dual (structural and functional) role of the PvdA N-terminal domain. PMID:18757814

  17. PVD TBC experience on GE aircraft engines

    NASA Technical Reports Server (NTRS)

    Maricocchi, Antonio; Bartz, Andi; Wortman, David

    1995-01-01

    The higher performance levels of modern gas turbine engines present significant challenges in the reliability of materials in the turbine. The increased engine temperatures required to achieve the higher performance levels reduce the strength of the materials used in the turbine sections of the engine. Various forms of thermal barrier coatings (TBC's) have been used for many years to increase the reliability of gas turbine engine components. Recent experience with the physical vapor deposition (PVD) process using ceramic material has demonstrated success in extending the service life of turbine blades and nozzles. Engine test results of turbine components with a 125 micron (0.005 in) PVD TBC have demonstrated component operating temperatures of 56-83 C (100-150 F) lower than non-PVD TBC components. Engine testing has also revealed the TBC is susceptible to high angle particle impact damage. Sand particles and other engine debris impact the TBC surface at the leading edge of airfoils and fracture the PVD columns. As the impacting continues, the TBC erodes away in local areas. Analysis of the eroded areas has shown a slight increase in temperature over a fully coated area, however a significant temperature reduction was realized over an airfoil without TBC.

  18. PVD TBC experience on GE aircraft engines

    NASA Technical Reports Server (NTRS)

    Bartz, A.; Mariocchi, A.; Wortman, D. J.

    1995-01-01

    The higher performance levels of modern gas turbine engines present significant challenges in the reliability of materials in the turbine. The increased engine temperatures required to achieve the higher performance levels reduce the strength of the materials used in the turbine sections of the engine. Various forms of Thermal Barrier Coatings (TBC's) have been used for many years to increase the reliability of gas turbine engine components. Recent experience with the Physical Vapor Deposition (PVD) process using ceramic material has demonstrated success in extending the service life of turbine blades and nozzles. Engine test results of turbine components with a 125 micrometer (0.005 in) PVD TBC have demonstrated component operating temperatures of 56-83 C (100-150 F) lower than uncoated components. Engine testing has also revealed the TBC is susceptible to high angle particle impact damage. Sand particles and other engine debris impact the TBC surface at the leading edge of airfoils and fracture the PVD columns. As the impacting continues the TBC erodes away in local areas. Analysis of the eroded areas has shown a slight increase in temperature over a fully coated area, however, a significant temperature reduction was realized over an airfoil without any TBC.

  19. PVD TBC experience on GE aircraft engines

    NASA Astrophysics Data System (ADS)

    Maricocchi, A.; Bartz, A.; Wortman, D.

    1997-06-01

    The higher performance levels of modern gas turbine engines present significant challenges in the reli-ability of materials in the turbine. The increased engine temperatures required to achieve the higher per-formance levels reduce the strength of the materials used in the turbine sections of the engine. Various forms of thermal barrier coatings have been used for many years to increase the reliability of gas turbine engine components. Recent experience with the physical vapor deposition process using ceramic material has demonstrated success in extending the service life of turbine blades and nozzles. Engine test results of turbine components with a 125 μm (0.005 in.) PVD TBC have demonstrated component operating tem-peratures of 56 to 83 °C (100 to 150 °F) lower than non-PVD TBC components. Engine testing has also revealed that TBCs are susceptible to high angle particle impact damage. Sand particles and other engine debris impact the TBC surface at the leading edge of airfoils and fracture the PVD columns. As the impacting continues, the TBC erodes in local areas. Analysis of the eroded areas has shown a slight increase in temperature over a fully coated area ; however, a significant temperature reduc-tion was realized over an airfoil without TBC.

  20. Protection of yttria-stabilized zirconia for dental applications by oxidic PVD coating.

    PubMed

    Hübsch, C; Dellinger, P; Maier, H J; Stemme, F; Bruns, M; Stiesch, M; Borchers, L

    2015-01-01

    In this study, the application of transparent physical vapor deposition (PVD) coatings on zirconia ceramics was examined as an approach to retard the low-temperature degradation of zirconia for dental applications. Transparent monolayers of titanium oxide (TixOy) and multilayers consisting of titanium oxide-alumina-titanium oxide (TixOy-AlxOy-TixOy) were deposited onto standardized discs of 3Y-TZP using magnetron sputtering. Using X-ray photospectroscopy and time-of-flight secondary-ion mass spectrometry, the compositions of the coatings were verified, and an approximate thickness of 50 nm for each type of coating was ascertained. After aging the coated and uncoated samples in water vapor at 134°C and 3 bar for 4, 8, 16, 32, 64 and 128 h, the monoclinic phase content was determined using X-ray diffraction, and its impact on mechanical properties was assessed in biaxial flexural strength tests. In addition, the depth of the transformation zone was measured from scanning electron microscopy images of the fracture surfaces of hydrothermally aged samples. The results revealed that the tetragonal-to-monoclinic phase transformation of the zirconia ceramic was retarded by the application of PVD coatings. During the first stages of aging, the coated samples exhibited a significantly lower monoclinic phase content than the uncoated samples and, after 128 h of aging, showed a transformation zone which was only ∼12-15 μm thick compared to ∼30 μm in the control group. Biaxial flexural strength decreased by ∼10% during aging and was not influenced by the application of a PVD coating. PMID:25278443

  1. PVD Silicon Carbide as a Thin Film Packaging Technology for Antennas on LCP Substrates for Harsh Environments

    NASA Technical Reports Server (NTRS)

    Scardelletti, Maximilian C.; Stanton, John W.; Ponchak, George E.; Jordan, Jennifer L.; Zorman, Christian A.

    2010-01-01

    This paper describes an effort to develop a thin film packaging technology for microfabricated planar antennas on polymeric substrates based on silicon carbide (SiC) films deposited by physical vapor deposition (PVD). The antennas are coplanar waveguide fed dual frequency folded slot antennas fabricated on liquid crystal polymer (LCP) substrates. The PVD SiC thin films were deposited directly onto the antennas by RF sputtering at room temperature at a chamber pressure of 30 mTorr and a power level of 300 W. The SiC film thickness is 450 nm. The return loss and radiation patterns were measured before and after the SiC-coated antennas were submerged into perchloric acid for 1 hour. No degradation in RF performance or physical integrity of the antenna was observed.

  2. Magnetron sputtering source

    DOEpatents

    Makowiecki, D.M.; McKernan, M.A.; Grabner, R.F.; Ramsey, P.B.

    1994-08-02

    A magnetron sputtering source for sputtering coating substrates includes a high thermal conductivity electrically insulating ceramic and magnetically attached sputter target which can eliminate vacuum sealing and direct fluid cooling of the cathode assembly. The magnetron sputtering source design results in greater compactness, improved operating characteristics, greater versatility, and low fabrication cost. The design easily retrofits most sputtering apparatuses and provides for safe, easy, and cost effective target replacement, installation, and removal. 12 figs.

  3. Magnetron sputtering source

    DOEpatents

    Makowiecki, Daniel M.; McKernan, Mark A.; Grabner, R. Fred; Ramsey, Philip B.

    1994-01-01

    A magnetron sputtering source for sputtering coating substrates includes a high thermal conductivity electrically insulating ceramic and magnetically attached sputter target which can eliminate vacuum sealing and direct fluid cooling of the cathode assembly. The magnetron sputtering source design results in greater compactness, improved operating characteristics, greater versatility, and low fabrication cost. The design easily retrofits most sputtering apparatuses and provides for safe, easy, and cost effective target replacement, installation, and removal.

  4. Thermal stability of magnetron and ion beam sputtered top and bottom spin-valve films

    SciTech Connect

    Mao, Ming; Cerjan, Charlie; Hung, Stephanie; Miloslavsky, Lena; Chien, Chester; Sant, Sudhi

    2001-06-01

    The thermal stability of top and bottom IrMn exchange-biased spin-valve films prepared by ion beam deposition (IBD) and magnetron sputtering physical vapor deposition (PVD) is compared. These films exhibit identical temperature dependence for the exchange bias field H{sub ex}, with a blocking temperature of T{sub B}=250{degree}C, that is independent of preparation technique. Isothermal annealing at temperatures below T{sub B} led to a ln(t) dependent degradation in H{sub ex}, suggesting a thermal activation process. The high crystallographic quality of the IBD films leads to a superior stability compared to PVD films. Top spin-valve films are also found to be more stable than bottom spin-valve films. {copyright} 2001 American Institute of Physics.

  5. Thermal stability of magnetron and ion beam sputtered top and bottom spin-valve films

    NASA Astrophysics Data System (ADS)

    Mao, Ming; Cerjan, Charlie; Hung, Stephanie; Miloslavsky, Lena; Chien, Chester; Sant, Sudhi

    2001-06-01

    The thermal stability of top and bottom IrMn exchange-biased spin-valve films prepared by ion beam deposition (IBD) and magnetron sputtering physical vapor deposition (PVD) is compared. These films exhibit identical temperature dependence for the exchange bias field Hex, with a blocking temperature of TB=250 °C, that is independent of preparation technique. Isothermal annealing at temperatures below TB led to a ln(t) dependent degradation in Hex, suggesting a thermal activation process. The high crystallographic quality of the IBD films leads to a superior stability compared to PVD films. Top spin-valve films are also found to be more stable than bottom spin-valve films.

  6. Development and evaluation of two PVD-coated β-titanium orthodontic archwires for fluoride-induced corrosion protection.

    PubMed

    Krishnan, Vinod; Krishnan, Anand; Remya, R; Ravikumar, K K; Nair, S Asha; Shibli, S M A; Varma, H K; Sukumaran, K; Kumar, K Jyothindra

    2011-04-01

    The present research was aimed at developing surface coatings on β titanium orthodontic archwires capable of protection against fluoride-induced corrosion. Cathodic arc physical vapor deposition PVD (CA-PVD) and magnetron sputtering were utilized to deposit thin films of titanium aluminium nitride (TiAlN) and tungsten carbide/carbon (WC/C) coatings on β titanium orthodontic archwires. Uncoated and coated specimens were immersed in a high fluoride ion concentration mouth rinse, following a specially designed cycle simulating daily use. All specimens thus obtained were subjected to critical evaluation of parameters such as electrochemical corrosion behaviour, surface analysis, mechanical testing, microstructure, element release, and toxicology. The results confirm previous research that β titanium archwires undergo a degradation process when in contact with fluoride mouth rinses. The study confirmed the superior nature of the TiAlN coating, evident as many fewer changes in properties after fluoride treatment when compared with the WC/C coating. Thus, coating with TiAlN is recommended in order to reduce the corrosive effects of fluorides on β titanium orthodontic archwires. PMID:21111072

  7. Frequency agile relativistic magnetrons

    SciTech Connect

    Levine, J.S.; Harteneck, B.D.; Price, H.D.

    1995-11-01

    The authors are developing a family of frequency agile relativistic magnetrons to continuously cover the bands from 1 to 3 GHz. They have achieved tuning ranges of > 33%. The magnetrons have been operated repetitively in burst mode at rates up to 100 pps for 10 sec. Power is extracted from two resonators, and is in the range of 400--600 MW, fairly flat across the tuning bandwidth. They are using a network of phase shifters and 3-dB hybrids to combine the power into a single arm and to provide a continuously adjustable attenuator.

  8. Investigating the effect of Argon Pressure on DC and High Power Magnetron Plasmas

    NASA Astrophysics Data System (ADS)

    Bernales, Baysha; Bolat, Rustem; Anders, Andre; Slack, Jonathan; PAG Team; EETD Team

    2013-10-01

    Smart Glass is fabricated by depositing thin films of specialized material onto a transparent substrate. When a potential is applied across the surface of the Smart Glass, it changes its optical properties. Direct Current Magnetron Sputtering (DCMS) and High Power Impulse Magnetron Sputtering (HiPIMS) are two methods of PVD that are used to fabricate this material. In previous research, it has been noted that magnetron plasmas have localized ionization zones that rotate clockwise in DCMS and counterclockwise in HiPIMS. Not much is known about what causes the change in rotation. This research seeks to investigate what occurs during the first moments of plasma evolution. Both DC and high power magnetron plasmas were observed as Argon pressure was varied. It was found that pressure had a very pronounced effect on the floating-point potential signal that was received from the probes placed in the plasma. It was found that when a high-pressure jet of Argon was injected into the system, that the rotation pattern of the DC magnetron plasma was disrupted. It was also found that at certain pressures, the voltage signal was less indicative of azimuthal rotation and more indicative of z-direction breathing modes.

  9. Magnetron injection gun scaling

    SciTech Connect

    Lawson, W.

    1988-04-01

    Existing analytic design equations for magnetron injection guns (MIG's) are approximated to obtain a set of scaling laws. The constraints are chosen to examine the maximum peak power capabilities of MIG's. The scaling laws are compared with exact solutions of the design equations and are supported by MIG simulations.

  10. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

    SciTech Connect

    Anders, André

    2014-09-02

    In this study, high power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

  11. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

    DOE PAGESBeta

    Anders, André

    2014-09-02

    In this study, high power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in thismore » review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.« less

  12. Magnetron sputtered boron films

    DOEpatents

    Makowiecki, Daniel M.; Jankowski, Alan F.

    1998-01-01

    A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.

  13. Magnetron sputtered boron films

    DOEpatents

    Makowiecki, D.M.; Jankowski, A.F.

    1998-06-16

    A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence. 8 figs.

  14. A chemically stable PVD multilayer encapsulation for lithium microbatteries

    NASA Astrophysics Data System (ADS)

    Ribeiro, J. F.; Sousa, R.; Cunha, D. J.; Vieira, E. M. F.; Silva, M. M.; Dupont, L.; Goncalves, L. M.

    2015-10-01

    A multilayer physical vapour deposition (PVD) thin-film encapsulation method for lithium microbatteries is presented. Lithium microbatteries with a lithium cobalt oxide (LiCoO2) cathode, a lithium phosphorous oxynitride (LiPON) electrolyte and a metallic lithium anode are under development, using PVD deposition techniques. Metallic lithium film is still the most common anode on this battery technology; however, it presents a huge challenge in terms of material encapsulation (lithium reacts with almost any materials deposited on top and almost instantly begins oxidizing in contact with atmosphere). To prove the encapsulation concept and perform all the experiments, lithium films were deposited by thermal evaporation technique on top of a glass substrate, with previously patterned Al/Ti contacts. Three distinct materials, in a multilayer combination, were tested to prevent lithium from reacting with protection materials and atmosphere. These multilayer films were deposited by RF sputtering and were composed of lithium phosphorous oxide (LiPO), LiPON and silicon nitride (Si3N4). To complete the long-term encapsulation after breaking the vacuum, an epoxy was applied on top of the PVD multilayer. In order to evaluate oxidation state of lithium films, the lithium resistance was measured in a four probe setup (cancelling wires/contact resistances) and resistivity calculated, considering physical dimensions. A lithium resistivity of 0.16 Ω μm was maintained for more than a week. This PVD multilayer exonerates the use of chemical vapour deposition (CVD), glove-box chambers and sample manipulation between them, significantly reducing the fabrication cost, since battery and its encapsulation are fabricated in the same PVD chamber.

  15. A Hollow Cathode Magnetron (HCM)

    SciTech Connect

    S.A. Cohen; Z. Wang

    1998-04-01

    A new type of plasma sputtering device, named the hollow cathode magnetron (HCM), has been developed by surrounding a planar magnetron cathode with a hollow cathode structure (HCS). Operating characteristics of HCMs, current-voltage ( I-V ) curves for fixed discharge pressure and voltage-pressure ( V-p ) curves for fixed cathode current, are measured. Such characteristics are compared with their planar magnetron counterparts. New operation regimes, such as substantially lower pressures (0.3 mTorr), were discovered for HCMs. Cathode erosion profiles show marked improvement over planar magnetron in terms of material utilization. The use of HCMs for thin film deposition are discussed.

  16. Diffusion bonding of CMSX-4 to UDIMET 720 using PVD-coated interfaces and HIP

    SciTech Connect

    Larker, R.; Ockborn, J.; Selling, B.

    1999-07-01

    There is an increasing interest in development of manufacturing methods for Dual Property BLISKs (BLaded dISKs), consisting of creep resistant airfoils and fatigue resistant disks bonded together by a durable joint. Optimum heat treatments are, however, very different for creep resistant single crystal CMSX-4 and fatigue resistant polycrystalline Udimet 720 selected in this study, but fortunately the first aging treatment for CMSX-4 (1140 C, 2-6h, AC) is similar to the partial solution treatment of U 720 HS2 (1115 C, 4h, OQ). Based on this, diffusion bonding was performed by HIP at 1120 C and 200 MPa argon pressure for 4 h, followed by cooling to 400 C. Subsequently, a shortened Udimet 720 HS2 two-step aging treatment was adopted by heating to 650 C for 6 h followed by cooling to 400 C, heating to 760 C for 2 h, and finally cooling to R.T. under remaining HIP pressure. Plasma etching followed by thin (80 nm) PVD coating with either nickel or titanium were used to clean and protect the polished surfaces before joining. The selection of coatings was governed by the possibility to reduce oxidized nickel by flushing with hydrogen at 330 C during evacuation of the HIP capsules, and by the large solubility of oxygen in titanium. Hot tensile testing was performed at 750 C on both joined and reference materials subjected to the modified heat treatment. Initially solution treated Udimet 720 and CMSX-4 comprised the reference materials. The testing showed that joints with Ni-PV coatings were almost as strong as Udimet 720 (although with very limited elongation), while the joints with Ti-PVD coatings were weaker.

  17. Magic-T-Coupled Magnetrons

    NASA Technical Reports Server (NTRS)

    Dickinson, R. M.

    1985-01-01

    Outputs of two magnetrons added coherently in scheme based on resonant waveguide coupling and injection phase locking. In addition, filaments are turned off after starting. Overall effect is relatively-inexpensive, lowpower, noisy magnetrons generate clean carrier signals of higher power that ordinarily require more expensive klystrons.

  18. Magnetron tuner has locking feature

    NASA Technical Reports Server (NTRS)

    Martucci, V. J.

    1969-01-01

    Magnetron tuning arrangement features a means of moving a tuning ring axially within an anode cavity by a system of reduction gears engaging a threaded tuning shaft of lead screw. The shaft positions the tuning ring for the desired magnetron output frequency, and a washer prevents backlash.

  19. Structure and properties of PVD TiB{sub 2} coatings

    SciTech Connect

    Knotek, O.; Lugscheider, E.; Barimani, C.; Moeller, M.

    1997-10-01

    For optimizing machine parts about their function and lifetime not only the design has been varied but also the materials. Where moving parts are in contact with each other, mostly only a few nanometer thick layer guarantees the function. With surface coating by PVD the properties and structures of this layer can be modified, so the use of bulk material is not necessary. This study is about the development of a hard, wear resisting TiB{sub 2} coating for lubricant-free roller bearings. Therefore several pretensions must be fulfilled, for example, no change in the surface topography of the raceways and low temperature coating process for tempered materials. Consequently all coatings were done with the Magnetron sputter ion plating (MSIP) process. For the target material a hot isostatic pressed titanium diboride plate was used. This target is electrically conductive, so that the sputtering could be done with a dc plasma. Three different substrate materials were examined. These were tempered bearing steel (100 Cr 6), silicon nitride (Si{sub 3}N{sub 4}), and a cutting tool material (HS 6-5-2). For optimizing the coating process and adapting it to the different materials, the temperature and the bias voltage were varied. While Si{sub 3}N{sub 4} and HS 6-5-2 are insensitive to the coating temperature, the temperature of the tempered 100 Cr 6 must be lower than its tempering temperature otherwise a reduction in the hardness cannot be excluded and the support of the coating is not sufficient. The coatings were characterized by their microstructure and their mechanical properties.

  20. Recirculating Planar Magnetron Modeling and Experiments

    NASA Astrophysics Data System (ADS)

    Franzi, Matthew; Gilgenbach, Ronald; Hoff, Brad; French, Dave; Lau, Y. Y.

    2011-10-01

    We present simulations and initial experimental results of a new class of crossed field device: Recirculating Planar Magnetrons (RPM). Two geometries of RPM are being explored: 1) Dual planar-magnetrons connected by a recirculating section with axial magnetic field and transverse electric field, and 2) Planar cathode and anode-cavity rings with radial magnetic field and axial electric field. These RPMs have numerous advantages for high power microwave generation by virtue of larger area cathodes and anodes. The axial B-field RPM can be configured in either the conventional or inverted (faster startup) configuration. Two and three-dimensional EM PIC simulations show rapid electron spoke formation and microwave oscillation in pi-mode. Smoothbore prototype axial-B RPM experiments are underway using the MELBA accelerator at parameters of -300 kV, 1-20 kA and pulselengths of 0.5-1 microsecond. Implementation and operation of the first RPM slow wave structure, operating at 1GHz, will be discussed. Research supported by AFOSR, AFRL, L-3 Communications, and Northrop Grumman. Done...processed 1830 records...17:52:57 Beginning APS data extraction...17:52:57

  1. Nonsputtering impulse magnetron discharge

    SciTech Connect

    Khodachenko, G. V.; Mozgrin, D. V.; Fetisov, I. K.; Stepanova, T. V.

    2012-01-15

    Experiments with quasi-steady high-current discharges in crossed E Multiplication-Sign B fields in various gases (Ar, N{sub 2}, H{sub 2}, and SF{sub 6}) and gas mixtures (Ar/SF{sub 6} and Ar/O{sub 2}) at pressures from 10{sup -3} to 5 Torr in discharge systems with different configurations of electric and magnetic fields revealed a specific type of stable low-voltage discharge that does not transform into an arc. This type of discharge came to be known as a high-current diffuse discharge and, later, a nonsputtering impulse magnetron discharge. This paper presents results from experimental studies of the plasma parameters (the electron temperature, the plasma density, and the temperature of ions and atoms of the plasma-forming gas) of a high-current low-pressure diffuse discharge in crossed E Multiplication-Sign B fields.

  2. Double-sided Relativistic Magnetron

    NASA Astrophysics Data System (ADS)

    Agafonov, A. V.; Krastelev, E. G.

    1997-05-01

    A new scheme of a symmetricaly powered relativistic magnetron and several methods of localised electron flow forming in an interaction region are proposed to increase an efficiency of relativistic magnetrons. As will be shown, a very important reason is the effect of nonsymmetric feeding of power from one side of a magnetron, which is typical for experiments. One-sided powering leads to the axial drift of electrons, to the transformation of transverse velocities of electrons to longitudinal one and to the generation of a parasitic e-beam which does not take part in energy exchange between electrons and waves at all. A special driver was designed for double-sided powering of relativistic magnetrons. The proposed system is compact, rigid and capable of reliable operation at high repetition rates, which is advantageous for many applications. Several smooth-bore magnetrons were tested by means of computer simulations using PIC code KARAT. The results showed a dramatical difference between the dynamics of electron flow for one- and two-sided power feeding of a structure under test. Design of a driver and computer simulation results are presented.

  3. Nanocomposite metal amorphous-carbon thin films deposited by hybrid PVD and PECVD technique.

    PubMed

    Teixeira, V; Soares, P; Martins, A J; Carneiro, J; Cerqueira, F

    2009-07-01

    Carbon based films can combine the properties of solid lubricating graphite structure and hard diamond crystal structure, i.e., high hardness, chemical inertness, high thermal conductivity and optical transparency without the crystalline structure of diamond. Issues of fundamental importance associated with nanocarbon coatings are reducing stress, improving adhesion and compatibility with substrates. In this work new nanocomposite coatings with improved toughness based in nanocrystalline phases of metals and ceramics embedded in amorphous carbon matrix are being developed within the frame of a research project: nc-MeNxCy/a-C(Me) with Me = Mo, Si, Al, Ti, etc. Carbide forming metal/carbon (Me/C) composite films with Me = Mo, W or Ti possess appropriate properties to overcome the limitation of pure DLC films. These novel coating architectures will be adopted with the objective to decrease residual stress, improve adherence and fracture toughness, obtain low friction coefficient and high wear-resistance. Nanocomposite DLC's films were deposited by hybrid technique using a PVD-Physically Vapor Deposition (magnetron sputtering) and Plasma Enhanced Chemical Vapor Deposition (PECVD), by the use of CH4 gas. The parameters varied were: deposition time, substrate temperature (180 degrees C) and dopant (Si + Mo) of the amorphous carbon matrix. All the depositions were made on silicon wafers and steel substrates precoated with a silicon inter-layer. The characterisation of the film's physico-mechanical properties will be presented in order to understand the influence of the deposition parameters and metal content used within the a-C matrix in the thin film properties. Film microstructure and film hybridization state was characterized by Raman Spectroscopy. In order to characterize morphology SEM and AFM will be used. Film composition was measured by Energy-Dispersive X-ray analysis (EDS) and by X-ray photoelectron spectroscopy (XPS). The contact angle for the produced DLC's on

  4. Nanograined Net-Shaped Fabrication of Rhenium Components by EB-PVD

    SciTech Connect

    Singh, Jogender; Wolfe, Douglas E.

    2004-02-04

    Cost-effective net-shaped forming components have brought considerable interest into DoD, NASA and DoE. Electron beam physical vapor deposition (EB-PVD) offers flexibility in forming net-shaped components with tailored microstructure and chemistry. High purity rhenium (Re) components including rhenium-coated graphite balls, Re- plates and tubes have been successfully manufactured by EB-PVD. EB-PVD Re components exhibited sub-micron and nano-sized grains with high hardness and strength as compared to CVD. It is estimated that the cost of Re components manufactured by EB-PVD would be less than the current CVD and powder-HIP Technologies.

  5. Nanograined Net-Shaped Fabrication of Rhenium Components by EB-PVD

    NASA Astrophysics Data System (ADS)

    Singh, Jogender; Wolfe, Douglas E.

    2004-02-01

    Cost-effective net-shaped forming components have brought considerable interest into DoD, NASA and DoE. Electron beam physical vapor deposition (EB-PVD) offers flexibility in forming net-shaped components with tailored microstructure and chemistry. High purity rhenium (Re) components including rhenium-coated graphite balls, Re- plates and tubes have been successfully manufactured by EB-PVD. EB-PVD Re components exhibited sub-micron and nano-sized grains with high hardness and strength as compared to CVD. It is estimated that the cost of Re components manufactured by EB-PVD would be less than the current CVD and powder-HIP Technologies.

  6. Improved Thermal Cycling Durability of Thermal Barrier Coatings Manufactured by PS-PVD

    NASA Astrophysics Data System (ADS)

    Rezanka, S.; Mauer, G.; Vaßen, R.

    2014-01-01

    The plasma spray-physical vapor deposition (PS-PVD) process is a promising method to manufacture thermal barrier coatings (TBCs). It fills the gap between traditional thermal spray processes and electron beam physical vapor deposition (EB-PVD). The durability of PS-PVD manufactured columnar TBCs is strongly influenced by the compatibility of the metallic bondcoat (BC) and the ceramic TBC. Earlier investigations have shown that a smooth BC surface is beneficial for the durability during thermal cycling. Further improvements of the bonding between BC and TBC could be achieved by optimizing the formation of the thermally grown oxide (TGO) layer. In the present study, the parameters of pre-heating and deposition of the first coating layer were investigated in order to adjust the growth of the TGO. Finally, the durability of the PS-PVD coatings was improved while the main advantage of PS-PVD, i.e., much higher deposition rate in comparison to EB-PVD, could be maintained. For such coatings, improved thermal cycling lifetimes more than two times higher than conventionally sprayed TBCs, were measured in burner rigs at ~1250 °C/1050 °C surface/substrate exposure temperatures.

  7. Phase and Frequency Locked Magnetrons for SRF Sources

    SciTech Connect

    Neubauer, Michael; Johnson, Rolland

    2014-09-12

    There is great potential for a magnetron power source that can be controlled both in phase and frequency. Such a power source could revolutionize many particle accelerator systems that require lower capital cost and/or higher power efficiency. Beyond the accelerator community, phase and frequency locked magnetons could improve radar systems around the world and make affordable phased arrays for wireless power transmission for solar powered satellites. This joint project of Muons, Inc., Fermilab, and L-3 CTL was supported by an STTR grant monitored by the Nuclear Physics Office of the DOE Office of Science. The object of the program was to incorporate ferrite materials into the anode of a magnetron and, with appropriate biasing of the ferrites, to maintain frequency lock and to allow for frequency adjustment of the magnetron without mechanical tuners. If successful, this device would have a dual use both as a source for SRF linacs and for military applications where fast tuning of the frequency is a requirement. In order to place the materials in the proper location, several attributes needed to be modeled. First the impact of the magnetron’s magnetic field needed to be shielded from the ferrites so that they were not saturated. And second, the magnetic field required to change the frequency of the magnetron at the ferrites needed to be shielded from the region containing the circulating electrons. ANSYS calculations of the magnetic field were used to optimize both of these parameters. Once the design for these elements was concluded, parts were fabricated and a complete test assembly built to confirm the predictions of the computer models. The ferrite material was also tested to determine its compatibility with magnetron tube processing temperatures. This required a vacuum bake out of the chosen material to determine the cleanliness of the material in terms of outgassing characteristics, and a subsequent room temperature test to verify that the characteristics of

  8. Antibacterial PVD coatings doped with silver by ion implantation

    NASA Astrophysics Data System (ADS)

    Osés, J.; Palacio, J. F.; Kulkarni, S.; Medrano, A.; García, J. A.; Rodríguez, R.

    2014-08-01

    The antibacterial effect of certain metal ions, like silver, has been exploited since antiquity. Obviously, the ways to employ the biocide activity of this element have evolved throughout time and it is currently used in a wide range of clinical applications. The work presented here reports the results of an investigation focused on combining the protective properties of PVD coatings with the biocide property of silver, applied by ion implantation. For this purpose, chromium nitride layers were doped with silver implanted at two different doses (5 × 1016 and 1 × 1017 ion/cm2) at 100 keV of energy and perpendicular incidence. Full characterization of the coatings was performed to determine its topographical and mechanical properties. The concentration profile of Ag was analyzed by GD-OES. The thickness of the layers, nano-hardness, roughness, wear resistance and coefficient of friction were measured. Finally, the anti-bacterial efficacy of the coatings was determined following the JIS Z-2801:2010 Standard. The results provide clear insights into the efficacy of silver for antibacterial purposes, as well as on its influence in the mechanical and tribological behaviour of the coatings matrix.

  9. Plasma Spray-PVD: A New Thermal Spray Process to Deposit Out of the Vapor Phase

    NASA Astrophysics Data System (ADS)

    von Niessen, Konstantin; Gindrat, Malko

    2011-06-01

    Plasma spray-physical vapor deposition (PS-PVD) is a low pressure plasma spray technology recently developed by Sulzer Metco AG (Switzerland). Even though it is a thermal spray process, it can deposit coatings out of the vapor phase. The basis of PS-PVD is the low pressure plasma spraying (LPPS) technology that has been well established in industry for several years. In comparison to conventional vacuum plasma spraying (VPS) or low pressure plasma spraying (LPPS), the new proposed process uses a high energy plasma gun operated at a reduced work pressure of 0.1 kPa (1 mbar). Owing to the high energy plasma and further reduced work pressure, PS-PVD is able to deposit a coating not only by melting the feed stock material which builds up a layer from liquid splats but also by vaporizing the injected material. Therefore, the PS-PVD process fills the gap between the conventional physical vapor deposition (PVD) technologies and standard thermal spray processes. The possibility to vaporize feedstock material and to produce layers out of the vapor phase results in new and unique coating microstructures. The properties of such coatings are superior to those of thermal spray and electron beam-physical vapor deposition (EB-PVD) coatings. In contrast to EB-PVD, PS-PVD incorporates the vaporized coating material into a supersonic plasma plume. Owing to the forced gas stream of the plasma jet, complex shaped parts such as multi-airfoil turbine vanes can be coated with columnar thermal barrier coatings using PS-PVD. Even shadowed areas and areas which are not in the line of sight of the coating source can be coated homogeneously. This article reports on the progress made by Sulzer Metco in developing a thermal spray process to produce coatings out of the vapor phase. Columnar thermal barrier coatings made of Yttria-stabilized Zircona (YSZ) are optimized to serve in a turbine engine. This process includes not only preferable coating properties such as strain tolerance and erosion

  10. Characterization of tantalum nitride thin films synthesized by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Zaman, Anna

    Tantalum Nitride is chemically inert, oxidation resistant and hard. TaN finds its application as a protective coating on steel due to their excellent wear properties. It has become a very promising diffusion barrier material in Cu interconnect technology in microelectronics. TaN has not been analyzed as much as other transition metal nitrides like the TiN system because TaN exhibits various stable and metastable phases. The emergence of these phases and the different physical, chemical and mechanical properties depend on the growth technique and deposition conditions. TaN thin films were deposited using the magnetron PVD system in the SaNEL lab. The aim of this study was to identify the effect of processing parameters like N2/Ar ratio, substrate bias and temperature, on the emergence of the different phases present in TaN thin films and the effect of deposition conditions on the mechanical properties of these films. The phases present in the films, deposited at varying conditions were explored via low angle X-Ray Diffraction (XRD), hardness of the films was measured by Nanoindentation and tribological tests were carried out to measure the frictional and wear behavior. It was observed that at high percentage of Nitrogen (10%-25%) the main phase present was FCC TaN and as the nitrogen content was decreased a mixture of phases was present in these films. The hardness of the films increases as we decrease the Nitrogen content, yielding a film with a hardness of 37.1 GPa at 3% N2 with a substrate bias voltage of -100 V.

  11. A review-application of physical vapor deposition (PVD) and related methods in the textile industry

    NASA Astrophysics Data System (ADS)

    Shahidi, Sheila; Moazzenchi, Bahareh; Ghoranneviss, Mahmood

    2015-09-01

    Physical vapor deposition (PVD) is a coating process in which thin films are deposited by the condensation of a vaporized form of the desired film material onto the substrate. The PVD process is carried out in a vacuum. PVD processes include different types, such as: cathode arc deposition, electron beam physical vapor deposition, evaporative deposition, sputtering, ion plating and enhanced sputtering. In the PVD method, the solid coating material is evaporated by heat or by bombardment with ions (sputtering). At the same time, a reactive gas is also introduced; it forms a compound with the metal vapor and is deposited on the substrate as a thin film with highly adherent coating. Such coatings are used in a wide range of applications such as aerospace, automotive, surgical, medical, dyes and molds for all manner of material processing, cutting tools, firearms, optics, thin films and textiles. The objective of this work is to give a comprehensive description and review of the science and technology related to physical vapor deposition with particular emphasis on their potential use in the textile industry. Physical vapor deposition has opened up new possibilities in the modification of textile materials and is an exciting prospect for usage in textile design and technical textiles. The basic principle of PVD is explained and the major applications, particularly sputter coatings in the modification and functionalization of textiles, are introduced in this research.

  12. Characterization of hydrogenated and deuterated silicon carbide films codeposited by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Pantelica, D.; Ionescu, P.; Petrascu, H.; Dracea, M. D.; Statescu, M.; Matei, E.; Rasoga, O.; Stancu, C.; Marascu, V.; Ion, V.; Acsente, T.; Dinescu, G.

    2016-03-01

    In this work we present the deposition of amorphous SiC thin films by radiofrequency dual magnetron sputtering. The dependence of the deposited films properties over the discharges electrical power and the effect of hydrogenous species (H2 and/or D2) addition to main discharge gas (Ar) were investigated. Accurate elemental analysis of the samples, including detection of hydrogen and deuterium, was performed by ion beam analysis (IBA) techniques: RBS (Rutherford Backscattering Spectrometry) and ERDA (Elastic Recoil Detection Analysis). SiCx thin films with thicknesses between 1700 and 4500 Å and C/Si ratio between 0.2/1 and 1.25/1 were obtained in different deposition conditions. The results prove that thin films of amorphous SiC with well controlled properties can be produced using radiofrequency dual magnetron sputtering.

  13. PvdP is a tyrosinase that drives maturation of the pyoverdine chromophore in Pseudomonas aeruginosa.

    PubMed

    Nadal-Jimenez, Pol; Koch, Gudrun; Reis, Carlos R; Muntendam, Remco; Raj, Hans; Jeronimus-Stratingh, C Margot; Cool, Robbert H; Quax, Wim J

    2014-07-01

    The iron binding siderophore pyoverdine constitutes a major adaptive factor contributing to both virulence and survival in fluorescent pseudomonads. For decades, pyoverdine production has allowed the identification and classification of fluorescent and nonfluorescent pseudomonads. Here, we demonstrate that PvdP, a periplasmic enzyme of previously unknown function, is a tyrosinase required for the maturation of the pyoverdine chromophore in Pseudomonas aeruginosa. PvdP converts the nonfluorescent ferribactin, containing two iron binding groups, into a fluorescent pyoverdine, forming a strong hexadentate complex with ferrous iron, by three consecutive oxidation steps. PvdP represents the first characterized member of a small family of tyrosinases present in fluorescent pseudomonads that are required for siderophore maturation and are capable of acting on large peptidic substrates. PMID:24816606

  14. PvdP Is a Tyrosinase That Drives Maturation of the Pyoverdine Chromophore in Pseudomonas aeruginosa

    PubMed Central

    Nadal-Jimenez, Pol; Koch, Gudrun; Reis, Carlos R.; Muntendam, Remco; Raj, Hans; Jeronimus-Stratingh, C. Margot; Cool, Robbert H.

    2014-01-01

    The iron binding siderophore pyoverdine constitutes a major adaptive factor contributing to both virulence and survival in fluorescent pseudomonads. For decades, pyoverdine production has allowed the identification and classification of fluorescent and nonfluorescent pseudomonads. Here, we demonstrate that PvdP, a periplasmic enzyme of previously unknown function, is a tyrosinase required for the maturation of the pyoverdine chromophore in Pseudomonas aeruginosa. PvdP converts the nonfluorescent ferribactin, containing two iron binding groups, into a fluorescent pyoverdine, forming a strong hexadentate complex with ferrous iron, by three consecutive oxidation steps. PvdP represents the first characterized member of a small family of tyrosinases present in fluorescent pseudomonads that are required for siderophore maturation and are capable of acting on large peptidic substrates. PMID:24816606

  15. Structural characterization and high throughput screening of inhibitors of PvdQ, an NTN hydrolase involved in pyoverdine synthesis

    PubMed Central

    Drake, Eric J.; Gulick, Andrew M.

    2011-01-01

    The human pathogen Pseudomonas aeruginosa produces a variety of virulence factors including pyoverdine, a non-ribosomally produced peptide siderophore. The maturation pathway of the pyoverdine peptide is complex and provides a unique target for inhibition. Within the pyoverdine biosynthetic cluster is a periplasmic hydrolase, PvdQ, that is required for pyoverdine production. However, the precise role of PvdQ in the maturation pathway has not been biochemically characterized. We demonstrate herein that the initial module of the nonribosomal peptide synthetase PvdL adds a myristate moiety to the pyoverdine precursor. We extracted this acylated precursor, called PVDIq, from a pvdQ mutant strain and show that the PvdQ enzyme removes the fatty acid catalyzing one of the final steps in pyoverdine maturation. Incubation of PVDIq with crystals of PvdQ allowed us to capture the acylated enzyme and confirm through structural studies the chemical composition of the incorporated acyl chain. Finally, because inhibition of siderophore synthesis has been identified as a potential antibiotic strategy, we developed a high throughput screening assay and tested a small chemical library for compounds that inhibit PvdQ activity. Two compounds that block PvdQ have been identified and their binding within the fatty acid binding pocket structurally characterized. PMID:21892836

  16. Identification of inhibitors of PvdQ, an enzyme involved in the synthesis of the siderophore pyoverdine.

    PubMed

    Wurst, Jacqueline M; Drake, Eric J; Theriault, Jimmy R; Jewett, Ivan T; VerPlank, Lynn; Perez, Jose R; Dandapani, Sivaraman; Palmer, Michelle; Moskowitz, Samuel M; Schreiber, Stuart L; Munoz, Benito; Gulick, Andrew M

    2014-07-18

    Pseudomonas aeruginosa produces the peptide siderophore pyoverdine, which is used to acquire essential Fe(3+) ions from the environment. PvdQ, an Ntn hydrolase, is required for the biosynthesis of pyoverdine. PvdQ knockout strains are not infectious in model systems, suggesting that disruption of siderophore production via PvdQ inhibition could be exploited as a target for novel antibacterial agents, by preventing cells from acquiring iron in the low iron environments of most biological settings. We have previously described a high-throughput screen to identify inhibitors of PvdQ that identified inhibitors with IC50 values of ∼100 μM. Here, we describe the discovery of ML318, a biaryl nitrile inhibitor of PvdQ acylase. ML318 inhibits PvdQ in vitro (IC50 = 20 nM) by binding in the acyl-binding site, as confirmed by the X-ray crystal structure of PvdQ bound to ML318. Additionally, the PvdQ inhibitor is active in a whole cell assay, preventing pyoverdine production and limiting the growth of P. aeruginosa under iron-limiting conditions. PMID:24824984

  17. Plasma Spray-PVD: Plasma Characteristics and Impact on Coating Properties

    NASA Astrophysics Data System (ADS)

    Mauer, G.; Vaßen, R.

    2012-12-01

    Typical plasma characteristics of the plasma spray-physical vapour deposition (PS-PVD) process were investigated by optical emission spectroscopy. Electron temperatures were determined by Boltzmann plots while temperatures of the heavy species as well as electron densities were obtained by broadening analysis of spectral lines. The results show how the plasma properties and thermodynamic equilibrium conditions are affected by the admixture of hydrogen and the ambient chamber pressure. Some experimental examples of PS-PVD coatings demonstrate the impact on feedstock treatment and deposited microstructures.

  18. Experimental radiation cooled magnetrons for space

    NASA Technical Reports Server (NTRS)

    Brown, W. C.; Pollock, M.

    1991-01-01

    The heat disposal problem that occurs in the microwave generator of the Solar Power Satellite when it converts dc power from solar photovoltaic arrays into microwave power for transmission to earth is examined. A theoretical study is made of the radiation cooling of a magnetron directional amplifier, and some experimental data obtained from the QKH 2244 magnetron are presented. This instrument is an unpackaged microwave oven magnetron to which an anodized aluminum radiator has been attached and whose magnetic field is supplied by special samarium cobalt magnets.

  19. Experimental radiation cooled magnetrons for space

    NASA Astrophysics Data System (ADS)

    Brown, W. C.; Pollock, M.

    The heat disposal problem that occurs in the microwave generator of the Solar Power Satellite when it converts dc power from solar photovoltaic arrays into microwave power for transmission to earth is examined. A theoretical study is made of the radiation cooling of a magnetron directional amplifier, and some experimental data obtained from the QKH 2244 magnetron are presented. This instrument is an unpackaged microwave oven magnetron to which an anodized aluminum radiator has been attached and whose magnetic field is supplied by special samarium cobalt magnets.

  20. PvD1 defensin, a plant antimicrobial peptide with inhibitory activity against Leishmania amazonensis.

    PubMed

    do Nascimento, Viviane V; Mello, Érica de O; Carvalho, Laís P; de Melo, Edésio J T; Carvalho, André de O; Fernandes, Katia V S; Gomes, Valdirene M

    2015-01-01

    Plant defensins are small cysteine-rich peptides and exhibit antimicrobial activity against a variety of both plant and human pathogens. Despite the broad inhibitory activity that plant defensins exhibit against different micro-organisms, little is known about their activity against protozoa. In a previous study, we isolated a plant defensin named PvD1 from Phaseolus vulgaris (cv. Pérola) seeds, which was seen to be deleterious against different yeast cells and filamentous fungi. It exerted its effects by causing an increase in the endogenous production of ROS (reactive oxygen species) and NO (nitric oxide), plasma membrane permeabilization and the inhibition of medium acidification. In the present study, we investigated whether PvD1 could act against the protozoan Leishmania amazonensis. Our results show that, besides inhibiting the proliferation of L. amazonensis promastigotes, the PvD1 defensin was able to cause cytoplasmic fragmentation, formation of multiple cytoplasmic vacuoles and membrane permeabilization in the cells of this organism. Furthermore, we show, for the first time, that PvD1 defensin was located within the L. amazonensis cells, suggesting the existence of a possible intracellular target. PMID:26285803

  1. Electrical Properties of Gamma Irradiated PVdF Based Polymer Electrolytes

    SciTech Connect

    Ayoub, N.; Amin, Y. M.; Arof, A. K.

    2010-07-07

    The effect of different doses of {gamma}-irradiation on the conductivity of PVdF-LiPF{sub 6} solid polymer electrolyte (SPE) was investigated at room temperature. The dielectric constant and loss are seen to increase with increasing radiation doses.

  2. Pyoverdine and beyond: PvdS dependent gene regulation in Pseudomonas syringae

    Technology Transfer Automated Retrieval System (TEKTRAN)

    The extracytoplasmic function (ECF) sigma factor PvdS regulates the expression of genes in Pseudomonas aeruginosa encoding virulence factors and the biosynthesis and transport of pyoverdine, a siderophore involved in iron acquisition. The production of pyoverdine is a distinctive trait of the fluor...

  3. PvD1 defensin, a plant antimicrobial peptide with inhibitory activity against Leishmania amazonensis

    PubMed Central

    do Nascimento, Viviane V.; Mello, Érica de O.; Carvalho, Laís P.; de Melo, Edésio J.T.; Carvalho, André de O.; Fernandes, Katia V.S.; Gomes, Valdirene M.

    2015-01-01

    Plant defensins are small cysteine-rich peptides and exhibit antimicrobial activity against a variety of both plant and human pathogens. Despite the broad inhibitory activity that plant defensins exhibit against different micro-organisms, little is known about their activity against protozoa. In a previous study, we isolated a plant defensin named PvD1 from Phaseolus vulgaris (cv. Pérola) seeds, which was seen to be deleterious against different yeast cells and filamentous fungi. It exerted its effects by causing an increase in the endogenous production of ROS (reactive oxygen species) and NO (nitric oxide), plasma membrane permeabilization and the inhibition of medium acidification. In the present study, we investigated whether PvD1 could act against the protozoan Leishmania amazonensis. Our results show that, besides inhibiting the proliferation of L. amazonensis promastigotes, the PvD1 defensin was able to cause cytoplasmic fragmentation, formation of multiple cytoplasmic vacuoles and membrane permeabilization in the cells of this organism. Furthermore, we show, for the first time, that PvD1 defensin was located within the L. amazonensis cells, suggesting the existence of a possible intracellular target. PMID:26285803

  4. A Plasma Lens for Magnetron Sputtering

    SciTech Connect

    Anders, Andre; Brown, Jeff

    2010-11-30

    A plasma lens, consisting of a solenoid and potential-defining ring electrodes, has been placed between a magnetron and substrates to be coated. Photography reveals qualitative information on excitation, ionization, and the transport of plasma to the substrate.

  5. Peer-to-Peer Magnetron Locking

    NASA Astrophysics Data System (ADS)

    Cruz, Edward Jeffrey

    The viability of coherent power combination of multiple high-efficiency, moderate power magnetrons requires a thorough understanding of frequency and phase control. Injection locking of conventional magnetrons, and other types of oscillators, employing a master-to-slave configuration has been studied theoretically and experimentally. This dissertation focuses on the peer-to-peer locking, where each oscillator acts as a master of and slave to all others, between two conventional magnetrons, where the general condition for locking was recently derived. The experiments performed on peer-to-peer locking of two 1-kW magnetrons verify the recently developed theory on the condition under which the two nonlinear oscillators may be locked to a common frequency and relative phase. This condition reduces to Adler's classical locking condition (master-slave) if the coupling is one way. Dependent on the degree of coupling, the frequency of oscillation when locking occurs was found to not necessarily lie between the two magnetrons' free running frequencies. Likewise, when the locking condition was violated, the beat of the spectrum was not necessarily found to be equal to the difference between the free running frequencies. The frequency of oscillation and relative phase between the two magnetrons when locking did occur were found to correspond to one of two solution modes given by the recent theory. The accessibility of the two possible modes is yet to be determined. This work was supported by ONR, AFRL, AFOSR, L-3 Communications Electron Devices Division and Northrop-Grumman Corporation.

  6. Thermal Conductivity of EB-PVD Thermal Barrier Coatings Evaluated by a Steady-State Laser Heat Flux Technique

    NASA Technical Reports Server (NTRS)

    Zhu, Dongming; Miller, Robert A.; Nagaraj, Ben A.; Bruce, Robert W.

    2000-01-01

    The thermal conductivity of electron beam-physical vapor deposited (EB-PVD) Zr02-8wt%Y2O3 thermal barrier coatings was determined by a steady-state heat flux laser technique. Thermal conductivity change kinetics of the EB-PVD ceramic coatings were also obtained in real time, at high temperatures, under the laser high heat flux, long term test conditions. The thermal conductivity increase due to micro-pore sintering and the decrease due to coating micro-delaminations in the EB-PVD coatings were evaluated for grooved and non-grooved EB-PVD coating systems under isothermal and thermal cycling conditions. The coating failure modes under the high heat flux test conditions were also investigated. The test technique provides a viable means for obtaining coating thermal conductivity data for use in design, development, and life prediction for engine applications.

  7. The Photovoltaic Performances of PVdF-HFP Electrospun Membranes Employed Quasi-Solid-State Dye Sensitized Solar Cells.

    PubMed

    Gnana kumar, G; Balanay, Mannix P; Nirmala, R; Kim, Dong Hee; Raj kumar, T; Senthilkumar, N; Kim, Ae Rhan; Yoo, Dong Jin

    2016-01-01

    The PVdF-HFP nanofiber membranes with different molecular weight were prepared by electrospinning technique and were investigated as solid state electrolyte membranes in quasi solid state dye sensitized solar cells (QS-DSSC). The homogeneously distributed and fully interconnected nanofibers were obtained for all of the prepared PVdF-HFP electrospun membranes and the average fiber diameters of fabricated membranes were dependent upon the molecular weight of polymer. The thermal stability of electrospun PVdF-HFP membrane was decreased with a decrement of molecular weight, specifying the high heat transfer area of small diameter nanofibers. The QS-DSSC fabricated with the lower molecular weight PVdF-HFP electrospun nanofiber membrane exhibited the power conversion efficiency of 1 = 5.38%, which is superior over the high molecular weight membranes and is comparable with the liquid electrolyte. Furthermore, the electrospun PVdF-HFP membrane exhibited long-term durability over the liquid electrolyte, owing to the higher adsorption and retention efficiencies of liquid electrolyte in its highly porous and interconnected nanofibers. Thus the proposed electrospun PVdF-HFP membrane effectively tackled the volatilization and leakage of liquid electrolyte and provided good photoconversion efficiency associated with an excellent stability, which constructs the prepared electrospun membranes as credible solid state candidates for the application of QS-DSSCs. PMID:27398491

  8. Stability of Brillouin flow in planar, conventional, and inverted magnetrons

    NASA Astrophysics Data System (ADS)

    Simon, D. H.; Lau, Y. Y.; Greening, G.; Wong, P.; Hoff, B. W.; Gilgenbach, R. M.

    2015-08-01

    The Brillouin flow is the prevalent flow in crossed-field devices. We systematically study its stability in the conventional, planar, and inverted magnetron geometry. To investigate the intrinsic negative mass effect in Brillouin flow, we consider electrostatic modes in a nonrelativistic, smooth bore magnetron. We found that the Brillouin flow in the inverted magnetron is more unstable than that in a planar magnetron, which in turn is more unstable than that in the conventional magnetron. Thus, oscillations in the inverted magnetron may startup faster than the conventional magnetron. This result is consistent with simulations, and with the negative mass property in the inverted magnetron configuration. Inclusion of relativistic effects and electromagnetic effects does not qualitatively change these conclusions.

  9. Stability of Brillouin flow in planar, conventional, and inverted magnetrons

    SciTech Connect

    Simon, D. H.; Lau, Y. Y.; Greening, G.; Wong, P.; Gilgenbach, R. M.; Hoff, B. W.

    2015-08-15

    The Brillouin flow is the prevalent flow in crossed-field devices. We systematically study its stability in the conventional, planar, and inverted magnetron geometry. To investigate the intrinsic negative mass effect in Brillouin flow, we consider electrostatic modes in a nonrelativistic, smooth bore magnetron. We found that the Brillouin flow in the inverted magnetron is more unstable than that in a planar magnetron, which in turn is more unstable than that in the conventional magnetron. Thus, oscillations in the inverted magnetron may startup faster than the conventional magnetron. This result is consistent with simulations, and with the negative mass property in the inverted magnetron configuration. Inclusion of relativistic effects and electromagnetic effects does not qualitatively change these conclusions.

  10. Functional expression and activity of the recombinant antifungal defensin PvD1r from Phaseolus vulgaris L. (common bean) seeds

    PubMed Central

    2014-01-01

    Background Defensins are basic, cysteine-rich antimicrobial peptides that are important components of plant defense against pathogens. Previously, we isolated a defensin, PvD1, from Phaseolus vulgaris L. (common bean) seeds. Results The aim of this study was to overexpress PvD1 in a prokaryotic system, verify the biologic function of recombinant PvD1 (PvD1r) by comparing the antimicrobial activity of PvD1r to that of the natural defensin, PvD1, and use a mutant Candida albicans strain that lacks the gene for sphingolipid biosynthesis to unravel the target site of the PvD1r in C. albicans cells. The cDNA encoding PvD1, which was previously obtained, was cloned into the pET-32 EK/LIC vector, and the resulting construct was used to transform bacterial cells (Rosetta Gami 2 (DE3) pLysS) leading to recombinant protein expression. After expression had been induced, PvD1r was purified, cleaved with enterokinase and repurified by chromatographic steps. N-terminal amino acid sequencing showed that the overall process of the recombinant production of PvD1r, including cleavage with the enterokinase, was successful. Additionally, modeling revealed that PvD1r had a structure that was similar to the defensin isolated from plants. Purified PvD1 and PvD1r possessed inhibitory activity against the growth of the wild-type pathogenic yeast strain C. albicans. Both defensins, however, did not present inhibitory activity against the mutant strain of C. albicans. Antifungal assays with the wild-type C. albicans strains showed morphological changes upon observation by light microscopy following growth assays. PvD1r was coupled to FITC, and the subsequent treatment of wild type C. albicans with DAPI revealed that the labeled peptide was intracellularly localized. In the mutant strain, no intracellular labeling was detected. Conclusion Our results indicate that PvD1r retains full biological activity after recombinant production, enterokinase cleavage and purification. Additionally, our

  11. Low target power wafer sputtering regime identified during magnetron tantalum barrier physical vapor deposition

    SciTech Connect

    Stout, Phillip J.; Denning, Dean J.; Michaelson, Lynne M.; Bagchi, Sandeep; Zhang Da; Ventzek, Peter L. G.

    2005-07-15

    A wafer sputtering regime has been identified during tantalum barrier deposition using a magnetron physical vapor deposition (MPVD) tool. The MPVD tools are designed to operate at high target powers (tens of kW) where the highly directed energetic metal (athermal metal) is the dominant metal species incident on the wafer. Although athermal metal gives better coverage than neutral metal (thermal) due to the narrower range of incident strike angles to the wafer, shadowing by the feature geometries is still a concern. Having available a wafer sputter regime or 'resputter' regime in a PVD tool allows for redistribution of metal from horizontal surfaces in the feature exposed to the plasma to vertical surfaces in the feature. The key in obtaining a wafer sputter regime is the operation of the plasma source in a range that the wafer bias power is effective at generating a sufficient self-bias for sputtering to occur. Discussed are modeling results which predict the wafer sputtering regime and the experimental confirmation that the low target power wafer sputter regime exists. The identified sputter regime in MPVD is such that there is a net deposition of metal at the field. Metal thickness reduction does occur at the trench and via bottoms where much of the unionized metal is being shadowed yielding a lower deposition to sputtering ratio compared to the field.

  12. Analysis of peer-to-peer locking of magnetrons

    SciTech Connect

    Pengvanich, P.; Lau, Y. Y.; Cruz, E.; Gilgenbach, R. M.; Hoff, B.; Luginsland, J. W.

    2008-10-15

    The condition for mutual, or peer-to-peer, locking of two magnetrons is derived. This condition reduces to Adler's classical phase-locking condition in the limit where one magnetron becomes the 'master' and the other becomes the 'slave.' The formulation is extended to the peer-to-peer locking of N magnetrons, under the assumption that the electromagnetic coupling among the N magnetrons is modeled by an N-port network.

  13. Plasma Spray-Physical Vapor Deposition (PS-PVD) of Ceramics for Protective Coatings

    NASA Technical Reports Server (NTRS)

    Harder, Bryan J.; Zhu, Dongming

    2011-01-01

    In order to generate advanced multilayer thermal and environmental protection systems, a new deposition process is needed to bridge the gap between conventional plasma spray, which produces relatively thick coatings on the order of 125-250 microns, and conventional vapor phase processes such as electron beam physical vapor deposition (EB-PVD) which are limited by relatively slow deposition rates, high investment costs, and coating material vapor pressure requirements. The use of Plasma Spray - Physical Vapor Deposition (PS-PVD) processing fills this gap and allows thin (< 10 microns) single layers to be deposited and multilayer coatings of less than 100 microns to be generated with the flexibility to tailor microstructures by changing processing conditions. Coatings of yttria-stabilized zirconia (YSZ) were applied to NiCrAlY bond coated superalloy substrates using the PS-PVD coater at NASA Glenn Research Center. A design-of-experiments was used to examine the effects of process variables (Ar/He plasma gas ratio, the total plasma gas flow, and the torch current) on chamber pressure and torch power. Coating thickness, phase and microstructure were evaluated for each set of deposition conditions. Low chamber pressures and high power were shown to increase coating thickness and create columnar-like structures. Likewise, high chamber pressures and low power had lower growth rates, but resulted in flatter, more homogeneous layers

  14. Nanomechanical study of thin film nanocomposite and PVD thin films on polymer substrates for optical applications

    NASA Astrophysics Data System (ADS)

    Moghal, Jonathan; Bird, Andrew; Harris, Adrian H.; Beake, Ben D.; Gardener, Martin; Wakefield, Gareth

    2013-12-01

    The mechanical properties of ultrathin (<120 nm) films differ substantially from the bulk properties of the material and are also strongly substrate dependent. We compare the properties of two differing film systems; a high particle loading nanocomposite of silica and a multiple layer physical vapour deposition (PVD) coating by nanoindentation, nano-scratch and nano-impact followed by structural analysis. The work is undertaken on hardcoated polymer substrates and uses two types of anti-reflection coatings as test systems. The nanocomposite film comprises of a high (>50%) loading of silica nanoparticles in an inorganic binder, which demonstrates significant flex and elastic recovery whereas PVD films are subject to brittle failure even at low applied loads. Failure of the nanocomposite film, with the exception of minor plastic deformation, does not occur until the underlying substrate fails. Although the PVD film has a greater hardness than the nanocomposite, failure occurs at lower loads due to a number of toughness reducing factors including reduced modulus, modulus mismatch with the substrate and film thickness. The resistance of ultrathin films to external mechanical stresses is therefore related to a number of factors and not simply to film hardness, the most important of which are film structure and film mechanical matching to the substrate.

  15. Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Ward, Logan

    The demand for economical high-performance materials has brought attention to the development of advanced coatings. Recent advances in high power magnetron sputtering (HPPMS) have shown to improve tribological properties of coatings. These coatings offer increased wear and oxidation resistance, which may facilitate the use of more economical materials in harsh applications. This study demonstrates the use of novel forms of HPPMS, namely modulated pulsed-power magnetron sputtering (MPPMS) and deep oscillation magnetron sputtering (DOMS), for depositing TiN and Ti1-xAlxN tribological coatings on commonly used alloys, such as Ti-6Al-4V and Inconel 718. Both technologies have been shown to offer unique plasma characteristics in the physical vapor deposition (PVD) process. High power pulses lead to a high degree of ionization compared to traditional direct-current magnetron sputtering (DCMS) and pulsed magnetron sputtering (PMS). Such a high degree of ionization was previously only achievable by cathodic arc deposition (CAD); however, CAD can lead to increased macroparticles that are unfavorable in high friction and corrosive environments. MPPMS, DOMS, and other HPPMS techniques offer unique plasma characteristics and have been shown to produce coatings with refined grain structure, improved density, hardness, adhesion, and wear resistance. Using DOMS and MPPMS, TiN and Ti1-xAlxN coatings were deposited using PMS to compare microstructures and tribological performance. For Ti1-xAlxN, two sputtering target compositions, Ti 0.5Al0.5 and Ti0.3Al0.7, were used to evaluate the effects of MPPMS on the coating's composition and tribological properties. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD) were used to characterize microstructure and crystallographic texture. Several tribological properties were evaluated including: wear rate, coefficient of friction, adhesion, and nanohardness. Results show that substrate

  16. Non-Neutral Drift Resonance in Magnetrons

    NASA Astrophysics Data System (ADS)

    Kaup, D. J.

    2005-04-01

    We study the features of the RF fields in a magnetron, when the RF amplitude has saturated, in the nonrelativistic, electrostatic limit. In this saturated stage, the linear RF equations can be reduced to a fifth-order set of ordinary differential equations. Two modes of which are fast cyclotron modes, one mode is a fast drift wave, and the other two modes are the usual, well-known, slow magnetron modes. Here, we will study the interaction between the fast drift mode (diocotron mode) and the slow magnetron modes, at the diocotron resonance. We will also show that the fast cyclotron modes can be ignored at this resonance, and thereby can reduce the system to a third- order set of ordinary differential equations. Using multiscale techniques, we will then obtain solutions for the inner and the outer regions at the diocotron resonance, and thereby obtain the conversion and transmission rates between these three modes at the diocotron resonance.

  17. Hybrid diffusive/PVD treatments to improve the tribological resistance of Ti-6Al-4V.

    PubMed

    Marin, E; Offoiach, R; Lanzutti, A; Regis, M; Fusi, S; Fedrizzi, L

    2014-01-01

    Titanium alloys are nowadays used for a wide range of biomedical applications thanks to their combination of high mechanical resistance, high corrosion resistance and biocompatibility. Nevertheless, the applicability of titanium alloys is sometimes limited due to their low microhardness and tribological resistance. Thus the titanium alloys cannot be successfully applied to prosthetic joint couplings. A wide range of surface treatments, in particular PVD coatings such as CrN and TiN, have been used in order to improve the tribological behaviour of titanium alloys. However, the low microhardness of the titanium substrate often results in coating failure due to cracks and delamination. For this reason, hybrid technologies based on diffusive treatments and subsequent PVD coatings may improve the overall coating resistance. In this work, conventional PVD coatings of CrN or TiCN, deposited on Titanium Grade 5, were characterized and then combined with a standard thermal diffusive nitriding treatment in order to improve the tribological resistance of the titanium alloys and avoid coating delamination. The different treatments were studied by means of scanning electron microscopy both on the sample surface and in cross-section. In-depth composition profiles were obtained using glow discharge optical emission spectrometry (GDOES) and localized energy dispersive X-ray diffraction on linear scan-lines. The microhardness and adhesion properties of the different treatments were evaluated using Vickers microhardness tests at different load conditions. The indentations were observed by means of SEM in order to evaluate delaminated areas and the crack's shape and density. The tribological behaviour of the different treatments was tested in dry conditions and in solution, in alternate pin-on-flat configuration, with a frequency of 0.5 Hz. After testing, the surface was investigated by means of stylus profilometry and SEM both on the surface and in cross-section. The standalone PVD

  18. Effect of substrate temperature on the structural properties of magnetron sputtered titanium nitride thin films with brush plated nickel interlayer on mild steel

    NASA Astrophysics Data System (ADS)

    Subramanian, B.; Ashok, K.; Jayachandran, M.

    2008-12-01

    Thin films of titanium nitride (TiN) were prepared on mild steel (MS) by a physical vapor deposition (PVD) method namely direct current reactive magnetron sputtering. With the aim of improving the adhesion of TiN layer an additional Nickel interlayer was brush plated on the steel substrates prior to TiN film formation. The phase has been identified with X-ray diffraction (XRD) analysis, and the results show that the prominent peaks observed in the diffraction patterns correspond to the (1 1 1), (2 0 0) and (2 2 2) planes of TiN. Cross-sectional SEM indicated the presence of dense columnar structure. The mechanical properties (modulus and hardness) of these films were characterized by nanoindentation.

  19. IBA analysis and corrosion resistance of TiAlPtN/TiAlN/TiAl multilayer films deposited over a CoCrMo using magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Canto, C. E.; Andrade, E.; de Lucio, O.; Cruz, J.; Solís, C.; Rocha, M. F.; Alemón, B.; Flores, M.; Huegel, J. C.

    2016-03-01

    The corrosion resistance and the elemental profile of multilayer coatings of TiAlPtN/TiAlN/TiAl synthesized by Physical Vapor Deposition (PVD) reactive magnetron sputtering over a CoCrMo alloy substrate in 10 periods of 30 min each were analyzed and compared to those of the substrate alone and to that of a TiAlPtN single layer coating of the same thickness. The objective of the present work was to create multilayers with different amounts of Pt to enhance the corrosion resistance of a biomedical alloy of CoCrMo. Corrosion tests were performed using Simulated Body Fluid (SBF) using potentiodynamic polarization tests at typical body temperature. The elemental composition and thickness of the coatings were evaluated with the combination of two ion beam analysis (IBA) techniques: a Rutherford Backscattering Spectroscopy (RBS) with alpha beam and a Nuclear Reaction Analysis with a deuteron beam.

  20. High power impulse magnetron sputtering discharge

    SciTech Connect

    Gudmundsson, J. T.; Brenning, N.; Lundin, D.; Helmersson, U.

    2012-05-15

    The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron target in unipolar pulses at low duty cycle and low repetition frequency while keeping the average power about 2 orders of magnitude lower than the peak power. This results in a high plasma density, and high ionization fraction of the sputtered vapor, which allows better control of the film growth by controlling the energy and direction of the deposition species. This is a significant advantage over conventional dc magnetron sputtering where the sputtered vapor consists mainly of neutral species. The HiPIMS discharge is now an established ionized physical vapor deposition technique, which is easily scalable and has been successfully introduced into various industrial applications. The authors give an overview of the development of the HiPIMS discharge, and the underlying mechanisms that dictate the discharge properties. First, an introduction to the magnetron sputtering discharge and its various configurations and modifications is given. Then the development and properties of the high power pulsed power supply are discussed, followed by an overview of the measured plasma parameters in the HiPIMS discharge, the electron energy and density, the ion energy, ion flux and plasma composition, and a discussion on the deposition rate. Finally, some of the models that have been developed to gain understanding of the discharge processes are reviewed, including the phenomenological material pathway model, and the ionization region model.

  1. 1.2 Å resolution crystal structure of the periplasmic aminotransferase PvdN from Pseudomonas aeruginosa.

    PubMed

    Drake, Eric J; Gulick, Andrew M

    2016-05-01

    The Gram-negative pathogen Pseudomonas aeruginosa uses a nonribosomal peptide synthetase (NRPS) biosynthetic cluster for the production of a peptide siderophore. In addition to four multimodular NRPS proteins, the biosynthetic pathway also requires several additional enzymes involved in the production of nonproteinogenic amino acids and maturation of the peptide product. Among the proteins that are required for the final steps in pyoverdine synthesis is PvdN, a pyridoxal phosphate-dependent enzyme that catalyzes an uncharacterized step in pyoverdine production. This study reports the high-resolution structure of PvdN bound to a PLP cofactor solved by multi-wavelength anomalous dispersion (MAD). The PvdN model shows high structural homology to type I aspartate aminotransferases and also contains positive density that suggests an uncharacterized external aldimine. PMID:27139833

  2. Rational design of a transition state analogue with picomolar affinity for Pseudomonas aeruginosa PvdQ, a siderophore biosynthetic enzyme.

    PubMed

    Clevenger, Kenneth D; Wu, Rui; Er, Joyce A V; Liu, Dali; Fast, Walter

    2013-10-18

    The Pseudomonas aeruginosa enzyme PvdQ can process different substrates involved in quorum-sensing or in siderophore biosynthesis. Substrate selectivity was evaluated using steady-state kinetic constants for hydrolysis of N-acyl-homoserine lactones (HSLs) and p-nitrophenyl fatty acid esters. PvdQ prefers substrates with alkyl chains between 12 and 14 carbons long that do not bear a 3-oxo substitution and is revealed here to have a relatively high specificity constant for selected N-acyl-HSLs (kcat/KM = 10(5) to 10(6) M(-1) s(-1)). However, endogenous P. aeruginosa N-acyl-HSLs are ≥100-fold disfavored, supporting the conclusion that PvdQ was not primarily evolved to regulate endogenous quorum-sensing. PvdQ plays an essential biosynthetic role for the siderophore pyoverdine, on which P. aeruginosa depends for growth in iron-limited environments. A series of alkylboronate inhibitors was found to be reversible, competitive, and extremely potent (Ki ≥ 190 pM). A 1.8 Å X-ray structure shows that 1-tridecylboronic acid forms a monocovalent bond with the N-terminal β-chain Ser residue in the PvdQ heterodimer, mimicking a reaction transition state. This boronic acid inhibits growth of P. aeruginosa in iron-limited media, reproducing the phenotype of a genetic pvdQ disruption, although co-administration of an efflux pump inhibitor is required to maintain growth inhibition. These findings support the strategy of designing boron-based inhibitors of siderophore biosynthetic enzymes to control P. aeruginosa infections. PMID:23883096

  3. Magnetron cathodes in plasma electrode Pockels cells

    DOEpatents

    Rhodes, M.A.

    1995-04-25

    Magnetron cathodes, which produce high current discharges, form greatly improved plasma electrodes on each side of an electro-optic crystal. The plasma electrode has a low pressure gas region on both sides of the crystal. When the gas is ionized, e.g., by a glow discharge in the low pressure gas, the plasma formed is a good conductor. The gas electrode acts as a highly uniform conducting electrode. Since the plasma is transparent to a high energy laser beam passing through the crystal, the plasma is transparent. A crystal exposed from two sides to such a plasma can be charged up uniformly to any desired voltage. A typical configuration utilizes helium at 50 millitorr operating pressure and 2 kA discharge current. The magnetron cathode produces a more uniform plasma and allows a reduced operating pressure which leads to lower plasma resistivity and a more uniform charge on the crystal. 5 figs.

  4. Magnetron cathodes in plasma electrode pockels cells

    DOEpatents

    Rhodes, Mark A.

    1995-01-01

    Magnetron cathodes, which produce high current discharges, form greatly improved plasma electrodes on each side of an electro-optic crystal. The plasma electrode has a low pressure gas region on both sides of the crystal. When the gas is ionized, e.g., by a glow discharge in the low pressure gas, the plasma formed is a good conductor. The gas electrode acts as a highly uniform conducting electrode. Since the plasma is transparent to a high energy laser beam passing through the crystal, the plasma is transparent. A crystal exposed from two sides to such a plasma can be charged up uniformly to any desired voltage. A typical configuration utilizes helium at 50 millitorr operating. pressure and 2 kA discharge current. The magnetron cathode produces a more uniform plasma and allows a reduced operating pressure which leads to lower plasma resistivity and a more uniform charge on the crystal.

  5. Recirculating planar magnetrons: simulations and experiment

    SciTech Connect

    Franzi, Matthew; Gilgenbach, Ronald; French, David; Lau, Y.Y.; Simon, David; Hoff, Brad; Luginsland, John W.

    2011-07-01

    The Recirculating Planar Magnetron (RPM) is a novel crossed-field device whose geometry is expected to reduce thermal load, enhance current yield as well as ease the geometric limitations in scaling to high RF frequencies as compared to the conventional cylindrical magnetrons. The RPM has two different adaptations: A. Axial B field and radial E field; B. Radial B field and axial E field. The preliminary configuration (A) to be used in experiments at the University of Michigan consists of two parallel planar sections which join on either end by cylindrical regions to form a concentric extruded ellipse. Similar to conventional magnetrons, a voltage across the AK gap in conjunction with an axial magnetic field provides the electrons with an ExB drift. The device is named RPM because the drifting electrons recirculate from one planar region to the other. The drifting electrons interact with the resonantly tuned slow wave structure on the anode causing spoke formation. These electron spokes drive a RF electric field in the cavities from which RF power may be extracted to Waveguides. The RPM may be designed in either a conventional configuration with the anode on the outside, for simplified extraction, or as an inverted magnetron with the anode at the inner conductor, for fast start-up. Currently, experiments at the Pulsed Power and Microwave Laboratory at the University of Michigan are in the setup and design phase. A conventional RPM with planar cavities is to be installed on the Michigan Electron Long Beam Accelerator (MELBA) and is anticipated to operate at -200kV, 0.2T with a beam current of 1-10 kA at 1GHz. The conventional RPM consists of 12 identical planar cavities, 6 on each planar side, with simulated quality factor of 20.

  6. Particle contamination formation in magnetron sputtering processes

    SciTech Connect

    Selwyn, G.S.; Sequeda, F.; Huang, C.

    1997-07-01

    Defects caused by particulate contamination are an important concern in the fabrication of thin film products. Often, magnetron sputtering processes are used for this purpose. Particle contamination generated during thin film processing can be detected using laser light scattering, a powerful diagnostic technique which provides real-time, {ital in situ} imaging of particles {gt}0.3 {mu}m on the target, substrate, or in the plasma. Using this technique, we demonstrate that the mechanisms for particle generation, transport, and trapping during magnetron sputter deposition are different from the mechanisms reported in previously studied plasma etch processes, due to the inherent spatial nonuniformity of magnetically enhanced plasmas. During magnetron sputter deposition, one source of particle contamination is linked to portions of the sputtering target surface exposed to weaker plasma density. There, film redeposition induces filament or nodule growth. Sputter removal of these features is inhibited by the dependence of sputter yield on angle of incidence. These features enhance trapping of plasma particles, which then increases filament growth. Eventually the growths effectively {open_quotes}short-circuit{close_quotes} the sheath, causing high currents to flow through these features. This, in turn, causes mechanical failure of the growth resulting in fracture and ejection of the target contaminants into the plasma and onto the substrate. Evidence of this effect has been observed in semiconductor fabrication and storage disk manufacturing. Discovery of this mechanism in both technologies suggests it may be universal to many sputter processes. {copyright} {ital 1997 American Vacuum Society.}

  7. Failure of PVD/plasma sprayed thermal barrier coatings during thermal cycling

    SciTech Connect

    Teixeria, V.; Andritschky, M.; Gruhn, H.; Mallener, W.; Buchkremer, H.; Stoever, D.

    1995-12-31

    ZrO{sub 2}7Y{sub 2}O{sub 3} plasma sprayed coatings (PS top coating) were applied on high temperature Ni-based alloys precoated by Physical Vapor Deposition with a thin, dense, stabilized zirconia coating (PVD bond coat). The PS coatings were applied by Atmospheric Plasma Spraying (APS) and Inert gas Plasma Spraying (IPS at 2 bar) for different substrate temperatures. The thermal barrier coatings (TBCs) were tested by furnace isothermal cycling and flame thermal cycling at maximum temperatures between 1,000 C and 1,150 C. The temperature gradients within the duplex PVD/PS thermal barrier coatings during the thermal cycling process were modeled using an unsteady heat transfer program. This modeling enables the authors to calculate the transient thermal strains and stresses which contribute to a better understanding of the failure mechanisms of the TBC during thermal cycling. They have also studied experimentally the adherence and failure modes of these coating systems during this high temperature testing. The TBC failure mechanism during thermal cycling is discussed in the light of coating transient stresses and substrate oxidation.

  8. Method and apparatus for improved high power impulse magnetron sputtering

    DOEpatents

    Anders, Andre

    2013-11-05

    A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.

  9. Drastic improvement in the S-band relativistic magnetron operation

    SciTech Connect

    Sayapin, A.; Hadas, Y.; Krasik, Ya. E.

    2009-08-17

    The superior operation of a S-band relativistic magnetron powered by a Linear Induction Accelerator with {<=}400 kV, {<=}4 kA, and {approx}150 ns output pulses was revealed when the magnetron was coupled with a resonance load and a part of the generated microwave power stored in the resonator was reflected back to the magnetron. It is shown that, under optimal conditions, the efficiency of the magnetron operation increases by {approx}40% and the generated microwave power reaches the power of the electron beam.

  10. Drastic improvement in the S-band relativistic magnetron operation

    NASA Astrophysics Data System (ADS)

    Sayapin, A.; Hadas, Y.; Krasik, Ya. E.

    2009-08-01

    The superior operation of a S-band relativistic magnetron powered by a Linear Induction Accelerator with ≤400 kV, ≤4 kA, and ˜150 ns output pulses was revealed when the magnetron was coupled with a resonance load and a part of the generated microwave power stored in the resonator was reflected back to the magnetron. It is shown that, under optimal conditions, the efficiency of the magnetron operation increases by ˜40% and the generated microwave power reaches the power of the electron beam.

  11. Satellite Power System (SPS) magnetron tube assessment study

    NASA Technical Reports Server (NTRS)

    Brown, W. C.

    1981-01-01

    The data base was extended with respect to the magnetron directional amplifier and its operating parameters that are pertinent to its application in the solar power satellite. On the basis of the resulting extended data base the design of a magnetron was outlined that would meet the requirements of the SPS application and a technology program was designed that would result in its development. The proposed magnetron design for the SPS is a close scale of the microwave oven magnetron, and resembles it closely physically and electrically.

  12. Secondary-electrons-induced cathode plasma in a relativistic magnetron

    SciTech Connect

    Queller, T.; Gleizer, J. Z.; Krasik, Ya. E.

    2012-11-19

    Results of time- and space-resolved spectroscopic studies of cathode plasma during a S-band relativistic magnetron operation and a magnetically insulated diode having an identical interelectrode gap are presented. It was shown that in the case of the magnetron operation, one obtains an earlier, more uniform plasma formation due to energetic electrons' interaction with the cathode surface and ionization of desorbed surface monolayers. No differences were detected in the cathode's plasma temperature between the magnetron and the magnetically insulated diode operation, and no anomalous fast cathode plasma expansion was observed in the magnetron at rf power up to 350 MW.

  13. Satellite Power System (SPS) magnetron tube assessment study

    NASA Astrophysics Data System (ADS)

    Brown, W. C.

    1981-02-01

    The data base was extended with respect to the magnetron directional amplifier and its operating parameters that are pertinent to its application in the solar power satellite. On the basis of the resulting extended data base the design of a magnetron was outlined that would meet the requirements of the SPS application and a technology program was designed that would result in its development. The proposed magnetron design for the SPS is a close scale of the microwave oven magnetron, and resembles it closely physically and electrically.

  14. Turbulent electron beams generated by magnetron injection guns

    NASA Astrophysics Data System (ADS)

    Kalinin, Yu. A.; Starodubov, A. V.; Mushtakov, A. V.

    2011-06-01

    A detailed experimental investigation of oscillators based on a magnetron injection gun is carried out. Experimental data show that such oscillators offer a considerable advantage over other similar devices; namely, they are capable of generating powerful wideband noiselike microwave oscillations. This is because magnetron injection guns generate turbulent electron beams at their exit.

  15. Magnetron-Sputtered Amorphous Metallic Coatings

    NASA Technical Reports Server (NTRS)

    Thakoor, A. P.; Mehra, M.; Khanna, S. K.

    1985-01-01

    Amorphous coatings of refractory metal/metalloid-based alloys deposited by magnetron sputtering provide extraordinary hardness and wear resistance. Sputtering target fabricated by thoroughly mixing powders of tungsten, rhenium, and boron in stated proportions and pressing at 1,200 degrees C and 3,000 lb/in. to second power (21 MPa). Substrate lightly etched by sputtering before deposition, then maintained at bias of - 500 V during initial stages of film growth while target material sputtered onto it. Argon gas at pressure used as carrier gas for sputter deposition. Coatings dense, pinhole-free, extremely smooth, and significantly resistant to chemical corrosion in acidic and neutral aqueous environments.

  16. Injection moulding of optical functional micro structures using laser structured, PVD-coated mould inserts

    SciTech Connect

    Hopmann, Ch.; Weber, M.; Schöngart, M.; Schäfer, C.; Bobzin, K.; Bagcivan, N.; Brögelmann, T.; Theiß, S.; Münstermann, T.; Steger, M.

    2015-05-22

    Micro structured optical plastics components are intensively used i. e. in consumer electronics, for optical sensors in metrology, innovative LED-lighting or laser technology. Injection moulding has proven to be successful for the large-scale production of those parts. However, the production of those parts still causes difficulties due to challenges in the moulding and demoulding of plastics parts created with laser structured mould inserts. A complete moulding of the structures often leads to increased demoulding forces, which then cause a breaking of the structures and a clogging of the mould. An innovative approach is to combine PVD-coated (physical vapour deposition), laser structured inserts and a variothermal moulding process to create functional mic8iüro structures in a one-step process. Therefore, a PVD-coating is applied after the laser structuring process in order to improve the wear resistance and the anti-adhesive properties against the plastics melt. In a series of moulding trials with polycarbonate (PC) and polymethylmethacrylate (PMMA) using different coated moulds, the mould temperature during injection was varied in the range of the glass transition and the melt temperature of the polymers. Subsequently, the surface topography of the moulded parts is evaluated by digital 3D laser-scanning microscopy. The influence of the moulding parameters and the coating of the mould insert on the moulding accuracy and the demoulding behaviour are being analysed. It is shown that micro structures created by ultra-short pulse laser ablation can be successfully replicated in a variothermal moulding process. Due to the mould coating, significant improvements could be achieved in producing micro structured optical plastics components.

  17. Injection moulding of optical functional micro structures using laser structured, PVD-coated mould inserts

    NASA Astrophysics Data System (ADS)

    Hopmann, Ch.; Weber, M.; Schöngart, M.; Schäfer, C.; Bobzin, K.; Bagcivan, N.; Brögelmann, T.; Theiß, S.; Münstermann, T.; Steger, M.

    2015-05-01

    Micro structured optical plastics components are intensively used i. e. in consumer electronics, for optical sensors in metrology, innovative LED-lighting or laser technology. Injection moulding has proven to be successful for the large-scale production of those parts. However, the production of those parts still causes difficulties due to challenges in the moulding and demoulding of plastics parts created with laser structured mould inserts. A complete moulding of the structures often leads to increased demoulding forces, which then cause a breaking of the structures and a clogging of the mould. An innovative approach is to combine PVD-coated (physical vapour deposition), laser structured inserts and a variothermal moulding process to create functional mic8iüro structures in a one-step process. Therefore, a PVD-coating is applied after the laser structuring process in order to improve the wear resistance and the anti-adhesive properties against the plastics melt. In a series of moulding trials with polycarbonate (PC) and polymethylmethacrylate (PMMA) using different coated moulds, the mould temperature during injection was varied in the range of the glass transition and the melt temperature of the polymers. Subsequently, the surface topography of the moulded parts is evaluated by digital 3D laser-scanning microscopy. The influence of the moulding parameters and the coating of the mould insert on the moulding accuracy and the demoulding behaviour are being analysed. It is shown that micro structures created by ultra-short pulse laser ablation can be successfully replicated in a variothermal moulding process. Due to the mould coating, significant improvements could be achieved in producing micro structured optical plastics components.

  18. Influence of EB-PVD TBC Microstructure on Thermal Barrier Coating System Performance Under Cyclic Conditions

    SciTech Connect

    Leyens, C; Pint, B A; Schulz, U; Wright, I G

    1999-04-12

    The lifetimes of electron beam physical vapor deposited (EB-PVD) thermal barrier coating systems (TBCs) with three different microstructures of the Y2O3-stabilized ZrO, YSZ) ceramic top layer were investigated in lh thermal cycles at 1100 and 1150°C in flowing oxygen. Single crystal alloys CMSX-4 and Rene N5 that had been coated with an EB-PVD NiCoCrAlY bond coat were chosen as substrate materials. At 1150°C all samples failed after 80-100, lh cycles, predominantly at the bond coat/alumina interface after cooling down from test temperature. The alumina scale remained adherent to the YSZ after spallation. Despite the different YSZ microstructures no clear tendency regarding differences in spallation behavior were observed at 1150°C. At 1100°C the minimum lifetime was 750 , lh cycles for CMSX-4, whereas the first Rene N5 specimen failed after 1750, lh cycles. The longest TBC lifetime on CMSX-4 substrates was 1250, lh cycles, whereas the respective Rene N5 specimens have not yet failed after 2300, lh cycles. The failure mode at 1100°C was identical to that at 1150°C, i.e. the TBC spalled off the surface exposing bare metal after cooling. Even though not all specimens have failed to date, the available results at 1100°C suggested that both, the substrate alloy chemistry and the YSZ microstructure significantly affect the spallation resistance of the TBC.

  19. Analytic formulas for magnetron characteristic curves

    SciTech Connect

    Riyopoulos, S.

    1995-12-31

    A closed non-linear set of equations is obtained based on the guiding center fluid model to describe steady-state magnetron operation. Spoke charge effects are included self-consistently, by introducing a mean-field approximation so that the effective AC potential preserves the geometric similarity with the vacuum solutions. New characteristic equations, relating the anode current 1 and the RF power P to the applied DC voltage V at given RF frequency, are obtained. Previously obtained V-I equations disagree with experiments in that (a) anode current and RF power go to zero when the resonance condition V = V{sub s} is met, (b) the operation voltage V is a double-valued function of the current I; there exist two nearly symmetric operation points around V{sub s} at the same current I. Yet magnetrons, and the related crossed-field amplifiers, are known to exhibit stable operation with single valued V-I characteristics well below V{sub s}. Although zero gain at synchronism applies to other microwave devices (TWT`s, FEL`s), experimental results and particle simulations of crossed field devices suggest otherwise. The new formulas show reasonable agreement with experiments.

  20. Analysis of DC magnetron sputtered beryllium films

    SciTech Connect

    Price, C.W.; Hsieh, E.J.; Lindsey, E.F.; Pierce, E.L.; Norberg, J.C.

    1988-10-01

    We are evaluating techniques that alter the columnar grain structure in sputtered beryllium films on fused silica substrates. The films are formed by DC magnetron sputtering, and the columnar structure, which is characteristic of this and most other deposition techniques, is highly detrimental to the tensile strength of the films. Attempts to modify the columnar structure by using RF-biased sputtering combined with nitrogen pulsing have been successful, and this paper describes the analyses of these films. Sputtered beryllium films are quite brittle, and the columnar structure in particular tends to form a distinct intergranular fracture; therefore, the grain structure was analyzed in fractured specimens using the high-resolution capability of a scanning electron microscope (SEM) equipped with a field emission gun (FESEM). Ion microanalysis using secondary-ion mass spectroscopy (SIMS) was conducted on some specimens to determining relative contamination levels introduced by nitrogen pulsing. The capability to perform quantitative SIMS analyses using ion-implanted specimens as standards also is being developed. This work confirms that the structure of DC magnetron sputtered beryllium can be improved significantly with combined nitrogen pulsing and RF-biased sputtering. 8 refs.

  1. Dynamics of Magnetic Insulation Violation in Smooth-bore Magnetrons

    NASA Astrophysics Data System (ADS)

    Agafonov, A. V.; Fedorov, V. M.; Tarakanov, V. P.

    1997-05-01

    The efficiency of large and high-power magnetrons of GW power levels is less than 30% and an inherent pulse-length and repetition rate limitations seems to exist because of use of explosive field emission. Another approach is the development of low voltage high-efficiency magnetrons utilizing a secondary emission magnetron array with high repetition rate. The numerical model of nonstationary nonuniform secondary electron emission from a cathode surface has been developed. The results of the first steps in computer simulations of an electron cloud formation inside a smooth-bore magnetron under the condition of the back-bombardement instability (BBI) are presented. A mechanism of the violation of the magnetic insulation are considered. Calculations have been performed for a coaxial smooth-bore magnetron and for magnetrons with different types of azimuthal inhomogeneities which could help the grow of BBI, and for magnetrons of different aspect ratios. The results of computer simulation are compared with experimental data. The main calculations of the beam dynamics were carried out with PIC-code KARAT.

  2. Magnetron sputtering for the production of EUV mask blanks

    NASA Astrophysics Data System (ADS)

    Kearney, Patrick; Ngai, Tat; Karumuri, Anil; Yum, Jung; Lee, Hojune; Gilmer, David; Vo, Tuan; Goodwin, Frank

    2015-03-01

    Ion Beam Deposition (IBD) has been the primary technique used to deposit EUV mask blanks since 1995 when it was discovered it could produce multilayers with few defects. Since that time the IBD technique has been extensively studied and improved and is finally approaching usable defectivities. But in the intervening years, the defectivity of magnetron sputtering has been greatly improved. This paper evaluates the suitability of a modern magnetron tool to produce EUV mask blanks and the ability to support HVM production. In particular we show that the reflectivity and uniformity of these tools are superior to current generation IBD tools, and that the magnetron tools can produce EUV films with defect densities comparable to recent best IBD tool performance. Magnetron tools also offer many advantages in manufacturability and tool throughput; however, challenges remain, including transitioning the magnetron tools from the wafer to mask formats. While work continues on quantifying the capability of magnetron sputtering to meet the mask blank demands of the industry, for the most part the remaining challenges do not require any fundamental improvements to existing technology. Based on the recent results and the data presented in this paper there is a clear indication that magnetron deposition should be considered for the future of EUV mask blank production.

  3. n-Alkylboronic acid inhibitors reveal determinants of ligand specificity in the quorum-quenching and siderophore biosynthetic enzyme PvdQ.

    PubMed

    Clevenger, Kenneth D; Wu, Rui; Liu, Dali; Fast, Walter

    2014-10-28

    The enzyme PvdQ (E.C. 3.5.1.97) from Pseudomonas aeruginosa is an N-terminal nucleophile hydrolase that catalyzes the removal of an N-myristyl substituent from a biosynthetic precursor of the iron-chelating siderophore pyoverdine. Inhibitors of pyoverdine biosynthesis are potential antibiotics since iron is essential for growth and scarce in most infections. PvdQ also catalyzes hydrolytic amide bond cleavage of selected N-acyl-l-homoserine lactone quorum-sensing signals used by some Gram-negative pathogens to coordinate the transcription of virulence factors. The resulting quorum-quenching activity of PvdQ has potential applications in antivirulence therapies. To inform both inhibitor design and enzyme engineering efforts, a series of n-alkylboronic acid inhibitors of PvdQ was characterized to reveal determinants of ligand selectivity. A simple homologation series results in compounds with Ki values that span from 4.7 mM to 190 pM, with a dependence of ΔGbind values on chain length of -1.0 kcal/mol/CH2. X-ray crystal structures are determined for the PvdQ complexes with 1-ethyl-, 1-butyl-, 1-hexyl-, and 1-octylboronic acids at 1.6, 1.8, 2.0, and 2.1 Å resolution, respectively. The 1-hexyl- and 1-octylboronic acids form tetrahedral adducts with the active-site N-terminal Ser217 in the β-subunit of PvdQ, and the n-alkyl substituents are bound in the acyl-group binding site. The 1-ethyl- and 1-butylboronic acids also form adducts with Ser217 but instead form trigonal planar adducts and extend their n-alkyl substituents into an alternative binding site. These results are interpreted to propose a ligand discrimination model for PvdQ that informs the development of PvdQ-related tools and therapeutics. PMID:25290020

  4. Expression of L-ornithine Ndelta-oxygenase (PvdA) in fluorescent Pseudomonas species: an immunochemical and in silico study.

    PubMed

    Putignani, Lorenza; Ambrosi, Cecilia; Ascenzi, Paolo; Visca, Paolo

    2004-01-01

    Omega-amino acid monooxygenases (EC 1.14.13.-), catalysing the formation of hydroxamate precursors of microbial siderophores (e.g., pyoverdine), have so far eluded structural and biochemical characterisation. Here, the expression of recombinant L-ornithine-Ndelta-oxygenase (PvdA) from Pseudomonas aeruginosa PAO1 is reported. A library of eight monoclonal antibodies (MAbs) directed against PvdA has been generated. Two MAb families recognising the N- and C-terminal regions of PvdA were identified. The MAbs made it possible to demonstrate that 45-48 kDa PvdA homologues are expressed in response to iron limitation by different species and strains of fluorescent pseudomonads. Despite the different degrees in sequence similarity between P. aeruginosa PvdA and putative homologues from Pseudomonas fluorescens, Pseudomonas putida, Pseudomonas syringae, Burkholderia cepacia, and Ralstonia solanacearum, in silico domain scanning predicts an impressive conservation of putative cofactor and substrate binding domains. The MAb library was also used to monitor PvdA expression during the transition of P. aeruginosa from iron-sufficient to iron-deficient growth. PMID:14684153

  5. Phase and Frequency Locked Magnetrons for SRF Sources

    SciTech Connect

    Neubauer, M.; Johnson, R.P.; Popovic, M.; Moretti, A.; /Fermilab

    2009-05-01

    Magnetrons are low-cost highly-efficient microwave sources, but they have several limitations, primarily centered about the phase and frequency stability of their output. When the stability requirements are low, such as for medical accelerators or kitchen ovens, magnetrons are the very efficient power source of choice. But for high energy accelerators, because of the need for frequency and phase stability - proton accelerators need 1-2 degrees source phase stability, and electron accelerators need .1-.2 degrees of phase stability - they have rarely been used. We describe a novel variable frequency cavity technique which will be utilized to phase and frequency lock magnetrons.

  6. The effect of thermal aging on the thermal conductivity of plasma sprayed and EB-PVD thermal barrier coatings

    SciTech Connect

    Dinwiddie, R.B.; Beecher, S.C.; Porter, W.D.; Nagaraj, B.A.

    1996-05-01

    Thermal barrier coatings (TBCs) applied to the hot gas components of turbine engines lead to enhanced fuel efficiency and component reliability. Understanding the mechanisms which control the thermal transport behavior of the TBCs is of primary importance. Electron beam-physical vapor deposition (EV-PVD) and air plasma spraying (APS) are the two most commonly used coating techniques. These techniques produce coatings with unique microstructures which control their performance and stability. The density of the APS coatings was controlled by varying the spray parameters. The low density APS yttria-partially stabilized zirconia (yttria-PSZ) coatings yielded a thermal conductivity that is lower than both the high density APS coatings and the EB-PVD coatings. The thermal aging of both fully and partially stabilized zirconia are compared. The thermal conductivity of the coatings permanently increases upon exposure to high temperatures. These increases are attributed to microstructural changes within the coatings. This increase in thermal conductivity can be modeled using a relationship which depends on both the temperature and time of exposure. Although the EB-PVD coatings are less susceptible to thermal aging effects, results suggest that they typically have a higher thermal conductivity than APS coatings before thermal aging. The increases in thermal conductivity due to thermal aging for plasma sprayed partially stabilized zirconia have been found to be less than for plasma sprayed fully stabilized zirconia coatings.

  7. Microstructural analyses and wear behavior of the cemented carbide tools after laser surface treatment and PVD coating

    NASA Astrophysics Data System (ADS)

    Neves, Davi; Diniz, Anselmo Eduardo; Lima, Milton Sérgio Fernandes

    2013-10-01

    Adhesion is one of the most important characteristics of coating on cutting tools. Poor coating adhesion on the tool favors fragmentation and release of hard abrasive particles between the tool and the workpiece. These particles interact with the surfaces of the tool, accelerating its wear and decreasing tool life. One possible solution is the use of laser texturing prior to coating in order to achieve a desired surface topography with enhanced adhesion properties. In the texturing, a high-frequency short-pulse laser changes surface characteristics, generating resolidified material and selective vaporization. This work evaluated the effectiveness of laser texturing in improving the substrate-coating adhesion of PVD coated cemented carbide tools. To this end, the substrates were textured with a Nd:YAG laser, in four different intensities, and then coated with a PVD TiAlN film. To ascertain the effectiveness of laser texturing, Rockwell C indentation and turning experiments were performed on both textured tools and conventional unlasered tools. The PVD coated laser-textured tool showed better performance in the indentation and turning tests than the standard tools. A comparative evaluation of tool wear mechanisms indicated that texturing did not change the wear mechanisms, but altered their importance to tool wear. The anchoring provided by the higher roughness of the textured surface increased the adhesion of the coating on the substrate, thus increasing tool life. Additionally, the chemical modification of the carbide grains due to the laser heating might be responsible for an enhanced adhesion between coating and substrate.

  8. Tribological Properties of PVD Carbon-Copper Composite Films Reinforced by Titanium

    NASA Astrophysics Data System (ADS)

    Lungevics, J.; Leitans, A.; Rudzitis, J.; Bulahs, N.; Nazarovs, P.; Kovalenko, V.

    2016-02-01

    Carbon-copper composite coatings reinforced with titanium were deposited using high power magnetron sputtering technique. Tribological and metrological tests were performed using Taylor Hobson Talysurf Intra 50 measuring equipment and CSM Instruments ball-on-disk type tribometer. Friction coefficient and wear rate were determined at 2N, 4N, 6N loads. It was revealed that friction coefficient decreased at a higher Ti concentration, which was particularly expressed at bigger applied loads. However, wear volume values tended to increase in the beginning, till Ti concentration reached about 11 %, but then decreased, thus providing better nanocoating wear resistance.

  9. Ordering of Fine Particles in a Planar Magnetron Plasma

    SciTech Connect

    Hayashi, Y.; Takahashi, K.; Totsuji, H.; Ishihara, O.; Sato, N.; Watanabe, Y.; Adachi, S.

    2008-09-07

    Fine particles injected in a planar magnetron were pushed upward by diffusible plasma, leading to being suspended by the force balance with the gravity and forming three-dimensional structures on the two-dimensional structure formed by particle strings.

  10. Magnetron discharge sputtering for fabrication of nanogradient optical coatings

    NASA Astrophysics Data System (ADS)

    Volpian, O. D.; Kuzmichev, A. I.; Ermakov, G. F.; Krikunov, A. I.; Obod, Yu A.; Silin, N. V.; Shkatula, S. V.

    2015-11-01

    The technology of the middle frequency pulse reactive magnetron sputtering for fabrication of nanogradient optical coatings with smooth variation of refractive index was developed and studied. The technology is based on programmable motion of a substrate over two magnetrons with targets of different materials. The feature of the deposition process is a constant composition of reactive gas medium and an invariable magnetron operation mode. To realize this technology, an automatic computer-controlled sputtering system additionally comprising a gas discharge activator of reactive gas (oxygen) and an in situ optical monitor- spectrovisor has been built. The dielectric oxide-based nanogradient coatings of photon-barrier type were successfully fabricated. The obtained results confirm the high potential of the middle frequency pulse reactive magnetron sputtering of silicon and metal targets for fabrication of nanogradient dielectric optical coatings with excellent properties.

  11. The Qualitative Magnetron -- Part of a Computer-Based Tutorial

    NASA Astrophysics Data System (ADS)

    Mead, William C.; Browman, Andrew A.; Silbar, Richard R.

    1998-10-01

    The magnetron is a ubiquitous electromagnetic device, widely used in radar and microwave oven applications. However, it is not usually a part of a general physics curriculum and many practicing physicists have only a vague notion of how it works. We are developing a set of computer-based, self-paced tutorials on particle accelerators that targets a broad audience, including undergraduate science majors and industrial technicians. The magnetron is covered in our module Motion in Electromagnetic Fields as an example of a crossed-field device. We originally expected this to be an advanced topic at the graduate student level. We were pleased to find we could give a satisfying description of how the magnetron works at an introductory level, using pictures and words, without equations. This talk will present our qualitative discussion of the magnetron, direct to you from the computer screen.

  12. Performance and test results of a regulated magnetron pulser

    SciTech Connect

    Rose, C.R.; Warren, D.S.

    1998-12-31

    This paper describes the test results and performance of a 5.0-kV, 750-mA, regulated current pulser used to drive an Hitachi model 2M130 2,425-MHz magnetron. The magnetron is used to modulate the plasma in a particle accelerator injector. In this application, precise and stable rf power is crucial to extract a stable and accurate particle beam. A 10-kV high-voltage triode vacuum tube with active feedback is used to control the magnetron current and output rf power. The pulse width may be varied from as little as ten microseconds to continuous duty by varying the width of a supplied gate pulse. The output current level can be programmed between 10 and 750 mA. Current regulation and accuracy are better than 1%. The paper discusses the overall performance of the pulser and magnetron including anode current and rf power waveforms, linearity compliance, and vacuum tube performance.

  13. Satellite power system (SPS) magnetron tube assessment study

    NASA Technical Reports Server (NTRS)

    1980-01-01

    Taks performed to extend the data base and to define a technology development program for the magnetron directional amplifier for the SPS are reviewed. These include: (1) demonstrating the tracking of phase and amplitude of the microwave output to phase and amplitude references; (2) expanding the range of power over which the directional amplifier will operate; (3)recognizing the importance of amplitude control in overall system design and in simplifying power conditioning; (4) developing a preliminary design for the overall architecture of the power module; (5) demonstrating magnetron starting using the amplitude control system; (6) mathematically modelling and performing a computerized study of the pyrolytic graphite radiating fin; (7) defining the mass of the magnetic circuit for the SPS tube; (8) noise measurement; (9) achieving harmonic suppression by notch reflection filters; (10) estimating the mass of the transmitting antenna; (11) developing a magnetron package with power generation, phase control, and power condition functions; and (12) projecting magnetron package characteristics.

  14. Factors determining the efficiency of magnetron sputtering. Optimization criteria

    NASA Astrophysics Data System (ADS)

    Rogov, A. V.; Kapustin, Yu. V.; Martynenko, Yu. V.

    2015-02-01

    We report on the results of experimental study of the dependence of sputtering energy efficiency K w in a dc planar magnetron sputtering setup on the discharge power, working gas pressure, magnetic field, cathode erosion depth, and the structure of the gas puffing system and anode. We propose that this parameter be used for comparing the degree of perfection of the magnetron design irrespective of the magnetron size and structural features. The results of measurements of K w in sputtering of Al, Ti, Cr, Cu, Zn, Zr, Nb, Mo, Ag, In, Sn, Ta, W, Pt, and Au are considered. The optimization criterion is worked out for the magnetic system of the magnetron, which ensures the minimal working pressure and the maximal sputtering rate for the cathode. The results are analyzed theoretically.

  15. On the evolution of film roughness during magnetron sputtering deposition

    SciTech Connect

    Turkin, A. A.; Pei, Y. T.; Shaha, K. P.; Chen, C. Q.; Vainshtein, D. I.; De Hosson, J. Th. M.

    2010-11-15

    The effect of long-range screening on the surface morphology of thin films grown with pulsed-dc (p-dc) magnetron sputtering is studied. The surface evolution is described by a stochastic diffusion equation that includes the nonlocal shadowing effects in three spatial dimensions. The diffusional relaxation and the angular distribution of the incident particle flux strongly influence the transition to the shadowing growth regime. In the magnetron sputtering deposition the shadowing effect is essential because of the configuration of the magnetron system (finite size of sputtered targets, rotating sample holder, etc.). A realistic angular distribution of depositing particles is constructed by taking into account the cylindrical magnetron geometry. Simulation results are compared with the experimental data of surface roughness evolution during 100 and 350 kHz p-dc deposition, respectively.

  16. Rotating cylindrical magnetron sputtering: Simulation of the reactive process

    SciTech Connect

    Depla, D.; Mahieu, S.; Van Aeken, K.; Leroy, W. P.; Haemers, J.; De Gryse, R.; Li, X. Y.; Bogaerts, A.

    2010-06-15

    A rotating cylindrical magnetron consists of a cylindrical tube, functioning as the cathode, which rotates around a stationary magnet assembly. In stationary mode, the cylindrical magnetron behaves similar to a planar magnetron with respect to the influence of reactive gas addition to the plasma. However, the transition from metallic mode to poisoned mode and vice versa depends on the rotation speed. An existing model has been modified to simulate the influence of target rotation on the well known hysteresis behavior during reactive magnetron sputtering. The model shows that the existing poisoning mechanisms, i.e., chemisorption, direct reactive ion implantation and knock on implantation, are insufficient to describe the poisoning behavior of the rotating target. A better description of the process is only possible by including the deposition of sputtered material on the target.

  17. Substrate heating and cooling during magnetron sputtering of copper target

    NASA Astrophysics Data System (ADS)

    Shapovalov, Viktor I.; Komlev, Andrey E.; Bondarenko, Anastasia S.; Baykov, Pavel B.; Karzin, Vitaliy V.

    2016-02-01

    Heating and cooling processes of the substrate during the DC magnetron sputtering of the copper target were investigated. The sensitive element of a thermocouple was used as a substrate. It was found, that the heat outflow rate from the substrate is lower when the magnetron is turned off rather than when it is turned on. Furthermore, the heating rate, the ultimate temperature, and the heat outflow rate related to the deposition of copper atoms are directly proportional to the discharge current density.

  18. 3D Magnetron simulation with CST STUDIO SUITE

    SciTech Connect

    Balk, Monika C.

    2011-07-01

    The modeling of magnetrons compared to other tubes is more difficult since it requires 3D modeling rather than a 2D investigation. This is not only due to the geometry which can include complicated details to be modeled in 3D but also due to the interaction process itself. The electric field, magnetic field and particle movement span a 3D space. In this paper 3D simulations of a strapped magnetron with CSTSTUDIO SUITE{sup TM} are presented. (author)

  19. Mg Content Dependence of EML-PVD Zn-Mg Coating Adhesion on Steel Strip

    NASA Astrophysics Data System (ADS)

    Jung, Woo Sung; Lee, Chang Wook; Kim, Tae Yeob; De Cooman, Bruno C.

    2016-09-01

    The effect of coating thickness and Mg concentration on the adhesion strength of electromagnetic levitation physical vapor deposited Zn-Mg alloy coatings on steel strip was investigated. The phase fraction of Zn, Mg2Zn11, and MgZn2 was determined for a coating Mg concentration in the 0 to 15 wt pct range. Coatings with a Mg content less than 5 pct consisted of an Zn and Mg2Zn11 phase mixture. The coatings showed good adhesion strength and ductile fracture behavior. Coatings with a higher Mg concentration, which consisted of a Mg2Zn11 and MgZn2 phase mixture, had a poor adhesion strength and a brittle fracture behavior. The adhesion strength of PVD Zn-Mg alloy coatings was found to be related to the pure Zn phase fraction. The effect of coating thickness on adhesion strength was found to be negligible. The microstructure of the interface between steel and Zn-Mg alloy coatings was investigated in detail by electron microscopy, electron diffraction, and atom probe tomography.

  20. Evaluation of Osseous Integration of PVD-Silver-Coated Hip Prostheses in a Canine Model

    PubMed Central

    Hauschild, Gregor; Hardes, Jendrik; Gosheger, Georg; Blaske, Franziska; Wehe, Christoph; Karst, Uwe; Höll, Steffen

    2015-01-01

    Infection associated with biomaterials used for orthopedic prostheses remains a serious complication in orthopedics, especially tumor surgery. Silver-coating of orthopedic (mega)prostheses proved its efficiency in reducing infections but has been limited to surface areas exposed to soft tissues due to concerns of silver inhibiting osseous integration of cementless stems. To close this gap in the bactericidal capacity of silver-coated orthopedic prostheses extension of the silver-coating on surface areas intended for osseous integration seems to be inevitable. Our study reports about a PVD- (physical-vapor-deposition-) silver-coated cementless stem in a canine model for the first time and showed osseous integration of a silver-coated titanium surface in vivo. Radiological, histological, and biomechanical analysis revealed a stable osseous integration of four of nine stems implanted. Silver trace elemental concentrations in serum did not exceed 1.82 parts per billion (ppb) and can be considered as nontoxic. Changes in liver and kidney functions associated with the silver-coating could be excluded by blood chemistry analysis. This was in accordance with very limited metal displacement from coated surfaces observed by laser ablation inductively coupled plasma-mass spectrometry (LA-ICP-MS) 12 months after implantation. In conclusion our results represent a step towards complete bactericidal silver-coating of orthopedic prostheses. PMID:25695057

  1. Effect of Hf Additions to Pt Aluminide Bond Coats on EB-PVD TBC Life

    NASA Technical Reports Server (NTRS)

    Nesbitt, James; Nagaraj, Ben; Williams, Jeffrey

    2000-01-01

    Small Hf additions were incorporated into a Pt aluminide coating during chemical vapor deposition (CVD) on single crystal RENE N5 substrates. Standard yttria-stabilized zirconia top coats were subsequently deposited onto the coated substrates by electron beam-physical vapor deposition (EB-PVD). The coated substrates underwent accelerated thermal cycle testing in a furnace at a temperature in excess of 1121 C (2050 F) (45 minute hot exposure, 15 minute cool to approximately 121 C (250 F)) until the thermal barrier coating (TBC) failed by spallation. Incorporating Hf in the bond coat increased the TBC life by slightly more than three times that of a baseline coating without added Hf. Scanning electron microscopy of the spalled surfaces indicated that the presence of the Hf increased the adherence of the thermally grown alumina to the Pt aluminide bond coat. The presence of oxide pegs growing into the coating from the thermally grown alumina may also partially account for the improved TBC life by creating a near-surface layer with a graded coefficient of thermal expansion.

  2. Evaluation of osseous integration of PVD-silver-coated hip prostheses in a canine model.

    PubMed

    Hauschild, Gregor; Hardes, Jendrik; Gosheger, Georg; Stoeppeler, Sandra; Ahrens, Helmut; Blaske, Franziska; Wehe, Christoph; Karst, Uwe; Höll, Steffen

    2015-01-01

    Infection associated with biomaterials used for orthopedic prostheses remains a serious complication in orthopedics, especially tumor surgery. Silver-coating of orthopedic (mega)prostheses proved its efficiency in reducing infections but has been limited to surface areas exposed to soft tissues due to concerns of silver inhibiting osseous integration of cementless stems. To close this gap in the bactericidal capacity of silver-coated orthopedic prostheses extension of the silver-coating on surface areas intended for osseous integration seems to be inevitable. Our study reports about a PVD- (physical-vapor-deposition-) silver-coated cementless stem in a canine model for the first time and showed osseous integration of a silver-coated titanium surface in vivo. Radiological, histological, and biomechanical analysis revealed a stable osseous integration of four of nine stems implanted. Silver trace elemental concentrations in serum did not exceed 1.82 parts per billion (ppb) and can be considered as nontoxic. Changes in liver and kidney functions associated with the silver-coating could be excluded by blood chemistry analysis. This was in accordance with very limited metal displacement from coated surfaces observed by laser ablation inductively coupled plasma-mass spectrometry (LA-ICP-MS) 12 months after implantation. In conclusion our results represent a step towards complete bactericidal silver-coating of orthopedic prostheses. PMID:25695057

  3. Mg Content Dependence of EML-PVD Zn-Mg Coating Adhesion on Steel Strip

    NASA Astrophysics Data System (ADS)

    Jung, Woo Sung; Lee, Chang Wook; Kim, Tae Yeob; De Cooman, Bruno C.

    2016-07-01

    The effect of coating thickness and Mg concentration on the adhesion strength of electromagnetic levitation physical vapor deposited Zn-Mg alloy coatings on steel strip was investigated. The phase fraction of Zn, Mg2Zn11, and MgZn2 was determined for a coating Mg concentration in the 0 to 15 wt pct range. Coatings with a Mg content less than 5 pct consisted of an Zn and Mg2Zn11 phase mixture. The coatings showed good adhesion strength and ductile fracture behavior. Coatings with a higher Mg concentration, which consisted of a Mg2Zn11 and MgZn2 phase mixture, had a poor adhesion strength and a brittle fracture behavior. The adhesion strength of PVD Zn-Mg alloy coatings was found to be related to the pure Zn phase fraction. The effect of coating thickness on adhesion strength was found to be negligible. The microstructure of the interface between steel and Zn-Mg alloy coatings was investigated in detail by electron microscopy, electron diffraction, and atom probe tomography.

  4. Effect of Bond Coat Materials on Thermal Fatigue Failure of EB-PVD Thermal Barrier Coatings

    NASA Astrophysics Data System (ADS)

    Yamagishi, Satoshi; Okazaki, Masakazu; Sakaguchi, Motoki; Matsubara, Hideaki

    Effect of MCrAlY bond coat alloy systems on thermal fatigue failure of thermal barrier coatings (TBCs) was investigated, where the TBC specimen consisted of Ni-based superalloy IN738LC substrate, bond coat, and 8 wt.% Y2O3-stabilized ZrO2 (YSZ) top coat. The top coat was fabricated by EB-PVD method with 250 μm in thickness. Three kinds of MCrAlY alloys were studied as the bond coat material. Employing the originally developed test equipment, thermal fatigue tests were carried out, by applying thermal cycles between 400 and 950°C in air. Special attention was paid not only to the failure life of the TBC specimen, but also the underlying failure mechanisms. The experimental results clearly demonstrated that the effect of MCrAlY bond coat alloys on the thermal fatigue life was very significant. Some discussions were made on the experimental results based on the measurements of mechanical and metallurgical properties of the bond coat alloys: i.e., elastic stiffness, thermal expansion coefficient and high temperature oxidation resistance.

  5. Surface properties of Mo-implanted PVD TiN coatings using MEVVA source

    NASA Astrophysics Data System (ADS)

    Tian, Bin; Yue, Wen; Fu, Zhiqiang; Gu, Yanhong; Wang, Chengbiao; Liu, Jiajun

    2013-09-01

    To further improve the tribological properties of TiN coatings used on mechanical parts, Mo ions were implanted into PVD TiN coatings with Metal Vapor Vacuum Arc (MEVVA) source at the implantation dose as high as 1 × 1018 ions/cm2. Surface morphology, microstructures, and nano-hardness of TiN coatings were investigated by optical profilometer, X-ray diffraction (XRD), X-ray photoelectron spectroscope (XPS), and Nano Indenter System. The tribological properties were investigated on a ball-on-disk friction and wear tester. The XRD results demonstrated that the diffraction peak of Ti2N appeared in the Mo-implanted TiN coatings. However, there was obvious decrease of nano-hardness due to the soft Molybdenum phase and its oxides. It was approved that Mo-implanted TiN coatings could greatly improve their tribological properties and that the implantation at dose of 1 × 1018 ions/cm2 could result in much lower friction coefficient. The existence of soft molybdenum, lubricious molybdenum oxides and titanium oxides resulted in the remarkable reducing of the friction coefficient of TiN coatings with Mo-implantation.

  6. Characterization of Surface Properties and Microstructure of PVD-TiN Films Using Mevva Ion Implantation

    NASA Astrophysics Data System (ADS)

    Yang, J. H.; Cheng, M. F.; Luo, X. D.; Zhang, T. H.

    The PVD-TiN film was implanted with titanium ions and the improvement in surface wear resistance was investigated. Ti ion implantation was done using a metal vapor vacuum arc (MEVVA) ion source with an implantation dose of 2 × 1016 ions/cm2 and at an extraction voltage of 48 kV. The wear characteristics of the implanted zone was measured and compared to the performance of the unimplanted zone by a pin-on-disc apparatus and an optical interference microscope. The structure of the implanted zone and unimplanted one was observed by X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). A dynamic TRIM called TRIDYN was used to calculate the concentration depth profile of implanted Ti in TiN to investigate the profile of multi-charge state ions. The results showed that the improved wear resistance of the TiN film was mainly due to the presence of nano-order TiN crystal grains after Ti ion implantation.

  7. Evaluation of Antibacterial Activity of Titanium Surface Modified by PVD/PACVD Process.

    PubMed

    Ji, Min-Kyung; Lee, Min-Joo; Park, Sang-Won; Lee, Kwangmin; Yun, Kwi-Dug; Kim, Hyun-Seung; Oh, Gye-Jeong; Kim, Ji-Hyun; Lim, Hyun-Pil

    2016-02-01

    The aim of this study was to evaluate the response of Streptococcus mutans (S. mutans) via crystal violet staining assay on titanium surface modified by physical vapor deposition/plasma assisted chemical vapor deposition process. Specimens were divided into the following three groups: polished titanium (control group), titanium modified by DC magnetron sputtering (group TiN-Ti), and titanium modified by plasma nitriding (group N-Ti). Surface characteristics of specimens were observed by using nanosurface 3D optical profiler and field emission scanning electron microscope. Group TiN-Ti showed TiN layer of 1.2 microm in thickness. Group N-Ti was identified as plasma nitriding with X-ray photoelectron spectroscopy. Roughness average (Ra) of all specimens had values < or = 0.2 microm (the threshold Ra), which had no effect on bacterial adhesion. No significant difference of S. mutans adhesion was found between the surfaces of control, TiN-Ti, and N-Ti (P > 0.05). Within the process condition of this study, modified titanium surfaces by DC magnetron sputtering and plasma nitriding did not influence the adhesion of S. mutans. PMID:27433640

  8. Cloning and nucleotide sequence of the pvdA gene encoding the pyoverdin biosynthetic enzyme L-ornithine N5-oxygenase in Pseudomonas aeruginosa.

    PubMed Central

    Visca, P; Ciervo, A; Orsi, N

    1994-01-01

    The enzyme L-ornithine N5-oxygenase catalyzes the hydroxylation of L-ornithine (L-Orn), which represents an early step in the biosynthesis of the peptidic moiety of the fluorescent siderophore pyoverdin in Pseudomonas aeruginosa. A gene bank of DNA from P. aeruginosa PAO1 (ATCC 15692) was constructed in the broad-host-range cosmid pLAFR3 and mobilized into the L-Orn N5-oxygenase-defective (pvdA) P. aeruginosa mutant PALS124. Screening for fluorescent transconjugants made it possible to identify the trans-complementing cosmid pPV4, which was able to restore pyoverdin synthesis and L-Orn N5-oxygenase activity in the pvdA mutant PALS124. The 17-kb PAO1 DNA insert of pPV4 contained at least two genetic determinants involved in pyoverdin synthesis, i.e., pvdA and pvdC4, as shown by complementation analysis of a set of mutants blocked in different steps of the pyoverdin biosynthetic pathway. Deletion analysis, subcloning, and transposon mutagenesis enabled us to locate the pvdA gene in a minimum DNA fragment of 1.7 kb flanked by two SphI restriction sites. Complementation of the pvdA mutation was under stringent iron control; both pyoverdin synthesis and L-Orn N5-oxygenase activity were undetectable in cells of the trans-complemented mutant which had been grown in the presence of 100 microM FeCl3. The entire nucleotide sequence of the pvdA gene, from which the primary structure of the encoded polypeptide was deduced, was determined. The pvdA structural gene is 1,278 bp; the cloned DNA fragment contains at the 5' end of the gene a putative ribosome-binding site but apparently lacks known promoterlike sequences. The P. aeruginosa L-Orn N5-oxygenase gene codes for a 426-amino-acid peptide with a predicted molecular mass of 47.7 kDa and an isoelectric point of 8.1. The enzyme shows approximately 50% homology with functional analogs, i.e., L-lysine N6-hydroxylase of aerobactin-producing Escherichia coli and L-Orn N5-oxygenase of ferrichrome-producing Ustilago maydis. The pvd

  9. 3-D Printed High Power Microwave Magnetrons

    NASA Astrophysics Data System (ADS)

    Jordan, Nicholas; Greening, Geoffrey; Exelby, Steven; Gilgenbach, Ronald; Lau, Y. Y.; Hoff, Brad

    2015-11-01

    The size, weight, and power requirements of HPM systems are critical constraints on their viability, and can potentially be improved through the use of additive manufacturing techniques, which are rapidly increasing in capability and affordability. Recent experiments on the UM Recirculating Planar Magnetron (RPM), have explored the use of 3-D printed components in a HPM system. The system was driven by MELBA-C, a Marx-Abramyan system which delivers a -300 kV voltage pulse for 0.3-1.0 us, with a 0.15-0.3 T axial magnetic field applied by a pair of electromagnets. Anode blocks were printed from Water Shed XC 11122 photopolymer using a stereolithography process, and prepared with either a spray-coated or electroplated finish. Both manufacturing processes were compared against baseline data for a machined aluminum anode, noting any differences in power output, oscillation frequency, and mode stability. Evolution and durability of the 3-D printed structures were noted both visually and by tracking vacuum inventories via a residual gas analyzer. Research supported by AFOSR (grant #FA9550-15-1-0097) and AFRL.

  10. Thick beryllium coatings by magnetron sputtering

    SciTech Connect

    Wu, H; Nikroo, A; Youngblood, K; Moreno, K; Wu, D; Fuller, T; Alford, C; Hayes, J; Detor, A; Wong, M; Hamza, A; van Buuren, T; Chason, E

    2011-04-14

    Thick (>150 {micro}m) beryllium coatings are studied as an ablator material of interest for fusion fuel capsules for the National Ignition Facility (NIF). As an added complication, the coatings are deposited on mm-scale spherical substrates, as opposed to flats. DC magnetron sputtering is used because of the relative controllability of the processing temperature and energy of the deposits. We used ultra small angle x-ray spectroscopy (USAXS) to characterize the void fraction and distribution along the spherical surface. We investigated the void structure using a combination focused ion beam (FIB) and scanning electron microscope (SEM), along with transmission electron microscopy (TEM). Our results show a few volume percent of voids and a typical void diameter of less than two hundred nanometers. Understanding how the stresses in the deposited material develop with thickness is important so that we can minimize film cracking and delamination. To that end, an in-situ multiple optical beam stress sensor (MOSS) was used to measure the stress behavior of thick Beryllium coatings on flat substrates as the material was being deposited. We will show how the film stress saturates with thickness and changes with pressure.

  11. Multi-cathode unbalanced magnetron sputtering systems

    NASA Technical Reports Server (NTRS)

    Sproul, William D.

    1991-01-01

    Ion bombardment of a growing film during deposition is necessary in many instances to ensure a fully dense coating, particularly for hard coatings. Until the recent advent of unbalanced magnetron (UBM) cathodes, reactive sputtering had not been able to achieve the same degree of ion bombardment as other physical vapor deposition processes. The amount of ion bombardment of the substrate depends on the plasma density at the substrate, and in a UBM system the amount of bombardment will depend on the degree of unbalance of the cathode. In multi-cathode systems, the magnetic fields between the cathodes must be linked to confine the fast electrons that collide with the gas atoms. Any break in this linkage results in electrons being lost and a low plasma density. Modeling of the magnetic fields in a UBM cathode using a finite element analysis program has provided great insight into the interaction between the magnetic fields in multi-cathode systems. Large multi-cathode systems will require very strong magnets or many cathodes in order to maintain the magnetic field strength needed to achieve a high plasma density. Electromagnets offer the possibility of independent control of the plasma density. Such a system would be a large-scale version of an ion beam enhanced deposition (IBED) system, but, for the UBM system where the plasma would completely surround the substrate, the acronym IBED might now stand for Ion Blanket Enhanced Deposition.

  12. On reactive high power impulse magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Gudmundsson, J. T.

    2016-01-01

    High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapor deposition (IPVD) technique that is particularly promising for reactive sputtering applications. However, there are few issues that have to be resolved before the full potential of this technique can be realized. Here we give an overview of the key experimental findings for the reactive HiPIMS discharge. An increase in the discharge current is commonly observed with increased partial pressure of the reactive gas or decreased repetition pulse frequency. There are somewhat conflicting claims regarding the hysteresis effect in the reactive HiPIMS discharge as some report reduction or elimination of the hysteresis effect while others claim a feedback control is essential. The ion energy distribution of the metal ion and the atomic ion of the reactive gas are similar and extend to very high energies while the ion energy distribution of the working gas and the molecular ion of the reactive gas are similar and are much less energetic.

  13. Anisotropy of the electron component in a cylindrical magnetron discharge. II. Application to real magnetron discharge.

    PubMed

    Porokhova, I A; Golubovskii, Yu B; Behnke, J F

    2005-06-01

    The physical processes occurring in electrode regions and the positive column of a cylindrical magnetron discharge in crossed electric and magnetic fields are investigated based on the solution of the Boltzmann kinetic equation by a multiterm decomposition of the electron phase space distribution function in terms of spherical tensors. The influence of the distribution function anisotropy on the absolute values and radial profiles of the electron density and rates of various transport and collision processes is analyzed. The spiral lines for the directed particle and energy transport are obtained to illustrate the anisotropy effects in dependence on the magnetic field. The electron equipressure surfaces are constructed in the form of ellipsoids of pressure and their transformation in the cathode and anode regions is studied. A strong anisotropy of the energy flux tensor in contrast to a weak anisotropy of the momentum flux density tensor is found. Particular results are obtained for the cylindrical magnetron discharge in argon at pressure 3 Pa, current 200 mA, and magnetic fields ranging within 100 and 400 G. PMID:16089880

  14. Tracking the Magnetron Motion in FT-ICR Mass Spectrometry

    NASA Astrophysics Data System (ADS)

    Jertz, Roland; Friedrich, Jochen; Kriete, Claudia; Nikolaev, Evgeny N.; Baykut, Gökhan

    2015-08-01

    In Fourier transform ion cyclotron resonance spectrometry (FT-ICR MS) the ion magnetron motion is not usually directly measured, yet its contribution to the performance of the FT-ICR cell is important. Its presence is manifested primarily by the appearance of even-numbered harmonics in the spectra. In this work, the relationship between the ion magnetron motion in the ICR cell and the intensities of the second harmonic signal and its sideband peak in the FT-ICR spectrum is studied. Ion motion simulations show that during a cyclotron motion excitation of ions which are offset to the cell axis, a position-dependent radial drift of the cyclotron center takes place. This radial drift can be directed outwards if the ion is initially offset towards one of the detection electrodes, or it can be directed inwards if the ion is initially offset towards one of the excitation electrodes. Consequently, a magnetron orbit diameter can increase or decrease during a resonant cyclotron excitation. A method has been developed to study this behavior of the magnetron motion by acquiring a series of FT-ICR spectra using varied post-capture delay (PCD) time intervals. PCD is the delay time after the capture of the ions in the cell before the cyclotron excitation of the ion is started. Plotting the relative intensity of the second harmonic sideband peak versus the PCD in each mass spectrum leads to an oscillating "PCD curve". The position and height of minima and maxima of this curve can be used to interpret the size and the position of the magnetron orbit. Ion motion simulations show that an off-axis magnetron orbit generates even-numbered harmonic peaks with sidebands at a distance of one magnetron frequency and multiples of it. This magnetron offset is due to a radial offset of the electric field axis versus the geometric cell axis. In this work, we also show how this offset of the radial electric field center can be corrected by applying appropriate DC correction voltages to the

  15. Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films

    NASA Astrophysics Data System (ADS)

    Ehiasarian, A. P.; Vetushka, A.; Gonzalvo, Y. Aranda; Sáfrán, G.; Székely, L.; Barna, P. B.

    2011-05-01

    HIPIMS (High Power Impulse Magnetron Sputtering) discharge is a new PVD technology for the deposition of high-quality thin films. The deposition flux contains a high degree of metal ionization and nitrogen dissociation. The microstructure of HIPIMS-deposited nitride films is denser compared to conventional sputter technologies. However, the mechanisms acting on the microstructure, texture and properties have not been discussed in detail so far. In this study, the growth of TiN by HIPIMS of Ti in mixed Ar and N2 atmosphere has been investigated. Varying degrees of metal ionization and nitrogen dissociation were produced by increasing the peak discharge current (Id) from 5 to 30 A. The average power was maintained constant by adjusting the frequency. Mass spectrometry measurements of the deposition flux revealed a high content of ionized film-forming species, such as Ti1+, Ti2+ and atomic nitrogen N1+. Ti1+ ions with energies up to 50 eV were detected during the pulse with reducing energy in the pulse-off times. Langmuir probe measurements showed that the peak plasma density during the pulse was 3 × 1016 m-3. Plasma density, and ion flux ratios of N1+: N21+ and Ti1+: Ti0 increased linearly with peak current. The ratios exceeded 1 at 30 A. TiN films deposited by HIPIMS were analyzed by X-ray diffraction, and transmission electron microscopy. At high Id, N1+: N21+> 1 and Ti1+: Ti0> 1 were produced; a strong 002 texture was present and column boundaries in the films were atomically tight. As Id reduced and N1+: N21+ and Ti1+: Ti0 dropped below 1, the film texture switched to strong 111 with a dense structure. At very low Id, porosity between columns developed. The effects of the significant activation of the deposition flux observed in the HIPIMS discharge on the film texture, microstructure, morphology and properties are discussed.

  16. Analysis and experiments of self-injection magnetron

    NASA Astrophysics Data System (ADS)

    Yi, Zhang; Wen-Jun, Ye; Ping, Yuan; Huan-Cheng, Zhu; Yang, Yang; Ka-Ma, Huang

    2016-04-01

    Magnetrons are widely used in microwave-based industrial applications, which are rapidly developing. However, the coupling between their output frequency and power as well as their wideband spectra restricts their further application. In this work, the output frequency and power of a magnetron are decoupled by self-injection. Moreover, the spectral bandwidth is narrowed, and the phase noise is reduced for most loop phase values. In order to predict the frequency variation with loop phase and injection ratio, a theoretical model based on a circuit equivalent to the magnetron is developed. Furthermore, the developed model also shows that the self-injection magnetron is stabler than the free-running magnetron and that the magnetron’s phase noise can be reduced significantly for most loop phase values. Experimental results confirm the conclusions obtained using the proposed model. Project supported by the National Basic Research Program of China (Grant No. 2013CB328902) and the National Natural Science Foundation of China (Grant No. 61501311).

  17. Relation of thermal conductivity with process induced anisotropic void system in EB-PVD PYSZ thermal barrier coatings.

    SciTech Connect

    Renteria, A. F.; Saruhan, B.; Ilavsky, J.; German Aerospace Center

    2007-01-01

    Thermal barrier coatings (TBCs) deposited by Electron-beam physical deposition (EB-PVD) protect the turbine blades situated at the high pressure sector of the aircraft and stationary turbines. It is an important task to uphold low thermal conductivity in TBCs during long-term service at elevated temperatures. One of the most promising methods to fulfil this task is to optimize the properties of PYSZ-based ,TBC by tailoring its microstructure. Thermal conductivity of the EB-PVD produced PYSZ TBCs is influenced mainly by the size, shape, orientation and volume of the various types of porosity present in the coatings. These pores can be classified as open (inter-columnar and between feather arms gaps) and closed (intra-columnar pores). Since such pores are located within the three-dimensionally deposited columns and enclose large differences in their sizes, shapes, distribution and anisotropy, the accessibility for their characterization is very complex and requires the use of sophisticated methods. In this work, three different EB-PVD TBC microstructures were manufactured by varying the process parameters, yielding various characteristics of their pores. The corresponding thermal conductivities in as-coated state and after ageing at 1100C/1h and 100h were measured via Laser Flash Analysis Method (LFA). The pore characteristics and their individual effect on the thermal conductivity are analysed by USAXS which is supported by subsequent modelling and LFA methods, respectively. Evident differences in the thermal conductivity values of each microstructure were found in as-coated and aged conditions. In summary, broader columns introduce higher values in thermal conductivity. In general, thermal conductivity increases after ageing for all three investigated microstructures, although those with initial smaller pore surface area show smaller changes.

  18. Relation of Thermal Conductivity with Process Induced Anisotropic Void Systems in EB-PVD PYSZ Thermal Barrier Coatings

    SciTech Connect

    Renteria, A. Flores; Saruhan-Brings, B.; Ilavsky, J.

    2008-03-03

    Thermal barrier coatings (TBCs) deposited by Electron-beam physical deposition (EB-PVD) protect the turbine blades situated at the high pressure sector of the aircraft and stationary turbines. It is an important task to uphold low thermal conductivity in TBCs during long-term service at elevated temperatures. One of the most promising methods to fulfil this task is to optimize the properties of PYSZ-based TBC by tailoring its microstructure. Thermal conductivity of the EB-PVD produced PYSZ TBCs is influenced mainly by the size, shape, orientation and volume of the various types of porosity present in the coatings. These pores can be classified as open (inter-columnar and between feather arms gaps) and closed (intra-columnar pores). Since such pores are located within the three-dimensionally deposited columns and enclose large differences in their sizes, shapes, distribution and anisotropy, the accessibility for their characterization is very complex and requires the use of sophisticated methods. In this work, three different EB-PVD TBC microstructures were manufactured by varying the process parameters, yielding various characteristics of their pores. The corresponding thermal conductivities in as-coated state and after ageing at 11000C/1h and 100h were measured via Laser Flash Analysis Method (LFA). The pore characteristics and their individual effect on the thermal conductivity are analysed by USAXS which is supported by subsequent modelling and LFA methods, respectively. Evident differences in the thermal conductivity values of each microstructure were found in as-coated and aged conditions. In summary, broader columns introduce higher values in thermal conductivity. In general, thermal conductivity increases after ageing for all three investigated microstructures, although those with initial smaller pore surface area show smaller changes.

  19. Development of Production PVD-AIN Buffer Layer System and Processes to Reduce Epitaxy Costs and Increase LED Efficiency

    SciTech Connect

    Cerio, Frank

    2013-09-14

    was analyzed and improvements implemented to the Veeco PVD-AlN prototype system to establish a specification and baseline PVD-AlN films on sapphire and in parallel the evaluation of PVD AlN on silicon substrates began. In Phase II of the project a Beta tool based on a scaled-up process module capable of depositing uniform films on batches of 4”or 6” diameter substrates in a production worthy operation was developed and qualified. In Phase III, the means to increase the throughput of the PVD-AlN system was evaluated and focused primarily on minimizing the impact of the substrate heating and cooling times that dominated the overall cycle time.

  20. Magnetron deposition of coatings with evaporation of the target

    NASA Astrophysics Data System (ADS)

    Bleykher, G. A.; Krivobokov, V. P.; Yuryeva, A. V.

    2015-12-01

    We analyze the potentialities of the plasma in various types of magnetron sputtering systems including pulsed and liquid-target systems for producing intense emission of atoms and high-rate deposition of coatings. For this purpose, a mathematical model of thermal and erosion processes in the target is developed based on the heat conduction equations taking into account first-order phase transitions. Using this model, we determine the parameters of magnetrons for which intense evaporation of atoms from the target surface takes place. It is shown that evaporation leads to an increase in the growth rate of metal coatings by 1-2 orders of magnitude as compared to conventional magnetron systems based only on collisional sputtering.

  1. Very low pressure high power impulse triggered magnetron sputtering

    SciTech Connect

    Anders, Andre; Andersson, Joakim

    2013-10-29

    A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.

  2. Improved Poisson solver for cfa/magnetron simulation

    SciTech Connect

    Dombrowski, G.E.

    1996-12-31

    E{sub dc}, the static field of a device having vane-shaped anodes, has been determined by application of Hockney`s method, which in turn uses Buneman`s cyclic reduction. This result can be used for both cfa and magnetrons, but does not solve the general space-charge fields. As pointed out by Hockney, the matrix of coupling capacitive factors between the vane-defining mesh points can also be used to solve the Poisson equation for the entire cathode-anode domain. Space-charge fields of electrons between anode electrodes can now be determined. This technique also computes the Ramo function for the entire region. This method has been applied to the magnetron. Extension to the cfa with many different space-charge bunches does not appear to be practicable. Calculations for the type 4J50 magnetron by the various degrees of accuracy in solving the Poisson equation are compared with experimental measurements.

  3. Quantitative analysis of sputter processes in a small magnetron system

    SciTech Connect

    Knittel, Ivo; Gothe, Marc; Hartmann, Uwe

    2005-11-15

    Sputter deposition of titanium in argon from a small circular magnetron is characterized. The dependence of the deposition rate on pressure, power, and target-substrate distance has been measured. A framework for the application of the analytic approach by Keller and Simmons of ballistic and diffusive transport to simple three-dimensional sputter geometries is developed and applied. The sputter yield and the pressure-distance product are determined from the data set as the only fit parameters of the model. For the entire range of operation of the magnetron, the sputter process can be described in terms of the relatively simple approach.

  4. A high-efficiency relativistic magnetron with the filled dielectric

    NASA Astrophysics Data System (ADS)

    Wang, Xiao-Yu; Fan, Yu-Wei; Shi, Di-fu; Shu, Ting

    2016-07-01

    Relativistic magnetron (RM) is a popular high power microwave device. Filling the resonant cavities with the low-loss dielectric is a well-proven technology that improves the performance of RM. In order to enhance the power efficiency, a dielectric-filled relativistic magnetron (DFRM) is presented and investigated numerically with KARAT code in this paper. The simulation results indicate that the maximum power efficiency is enhanced from 50.0% in the conventional RM to 56.0% in the DFRM when the applied voltage and the magnetic field are 280 kV and 0.5 T, respectively. Besides, the simulation results are analyzed and discussed.

  5. Improved computer modelling of magnetron injection guns for gyrotrons

    SciTech Connect

    Caplan, M.; Thorington, C.

    1984-01-01

    A variable mesh finite-element electron gun design code has been developed to simulate hollow beams produced by magnetron injection guns. Very accurate solutions of the self-consistent space charge forces are obtained by using a computational mesh, distorted in a way which allows a high density of mesh points within the hollow beam. A generalized hybrid model for cathode emission has been incorporated which combines temperature limited and space charge limited emission in a way justified from empirical and physical arguments. Beam characteristics of a magnetron injection gun are presented as the transition from temperature limited to space charge limited operation is made. Limited comparisons with experimental results are presented.

  6. Magnetron sputtered boron films and Ti/B multilayer structures

    SciTech Connect

    Makowiecki, D.M.; Jankowski, A.F.

    1991-03-11

    A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor 5 deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band pass filters as well as the low Z element in low Z/high Z mirrors which enhance reflectivity 10 from grazing to normal incidence.

  7. Magnetron sputtered boron films and Ti/B multilayer structures

    DOEpatents

    Makowiecki, D.M.; Jankowski, A.F.

    1995-02-14

    A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band pass filters as well as the low Z element in low Z/high Z mirrors which enhance reflectivity from grazing to normal incidence. 6 figs.

  8. Magnetron sputtered boron films and TI/B multilayer structures

    DOEpatents

    Makowiecki, Daniel M.; Jankowski, Alan F.

    1993-01-01

    A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band pass filters as well as the low Z element in low Z/high Z mirrors which enhance reflectivity from grazing to normal incidence.

  9. Magnetron sputtered boron films and Ti/B multilayer structures

    DOEpatents

    Makowiecki, Daniel M.; Jankowski, Alan F.

    1995-01-01

    A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band pass filters as well as the low Z element in low Z/high Z mirrors which enhance reflectivity from grazing to normal incidence.

  10. Magnetron sputtered boron films and TI/B multilayer structures

    DOEpatents

    Makowiecki, D.M.; Jankowski, A.F.

    1993-04-20

    A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band pass filters as well as the low Z element in low Z/high Z mirrors which enhance reflectivity from grazing to normal incidence.

  11. Magnetron Sputtered Gold Contacts on N-gaas

    NASA Technical Reports Server (NTRS)

    Buonaquisti, A. D.; Matson, R. J.; Russell, P. E.; Holloway, P. H.

    1984-01-01

    Direct current planar magnetron sputtering was used to deposit gold Schottky barrier electrical contacts on n-type GaAs of varying doping densities. The electrical character of the contact was determined from current voltage and electron beam induced voltage data. Without reducing the surface concentration of carbon and oxide, the contacts were found to be rectifying. There is evidence that energetic neutral particles reflected from the magnetron target strike the GaAs and cause interfacial damage similar to that observed for ion sputtering. Particle irradiation of the surface during contact deposition is discussed.

  12. Analysis of the photo voltage decay /PVD/ method for measuring minority carrier lifetimes in P-N junction solar cells

    NASA Technical Reports Server (NTRS)

    Von Roos, O.

    1981-01-01

    The photo voltage decay (PVD) method for the measurement of minority carrier lifetimes in P-N junction solar cells with cell thickness comparable to or even less than the minority carrier diffusion length is examined. The method involves the generation of free carriers in the quasi-neutral bulk material by flashes of light and the monitoring of the subsequent decay of the induced open-circuit voltages as the carriers recombine, which is dependent on minority carrier recombination lifetime. It is shown that the voltage versus time curve for an ordinary solar cell (N(+)-P junction) is proportional to the inverse minority carrier lifetime plus a factor expressing the ratio of diffusion length to cell thickness. In the case of an ideal back-surface-field cell (N(+)-P-P(+) junction) however, the slope is directly proportional to the inverse minority carrier lifetime. It is noted that since most BSF cells are not ideal, possessing a sizable back surface recombination velocity, the PVD measurements must be treated with caution and supplemented with other nonstationary methods.

  13. Production of composite Si nanoparticles by plasma spraying PVD and CH4 annealing for negative electrodes of lithium ion batteries

    NASA Astrophysics Data System (ADS)

    Ohta, Ryoshi; Ohta, Yutaro; Tashiro, Toru; Kambara, Makoto

    2015-09-01

    Si is a promising candidate as anode of next generation high density Li ion batteries. This material, however, needs to be nanostructured, nanoparticles and C coating of active material, to cope with huge volume change and associated rapid capacity decay. Si nanoparticles with 20-40 nm have been successfully produced by plasma spraying PVD and also Si-C core-shell composite particles by adding CH4 during processing. The battery performance has been improved with these nanopowders as anode, especially with the C coated Si particles. However, SiC that is inactive in battery reaction forms inevitably at high temperature during plasma spraying PVD and reduces the capacity density. In this work, therefore, post CH4 annealing was attempted to form Si-C nanocomposite particles while suppressing formation of SiC. The primary Si nanoparticles were unchanged in size after annealing and were coated with the finer carbonous particles that formed after CH4 infiltration through pores between nanoparticles. The batteries using annealed powders with C/Si molar ratio of 0.3 have shown two-fold capacity retention increase after 50 cycles with no capacity reduction associated with SiC formation as compared to the powders without C. This work was partly supported by the Funding Program for Next Generation World-Leading Researchers (NEXT Program) of Japan.

  14. Hemocompatibility of Inorganic Physical Vapor Deposition (PVD) Coatings on Thermoplastic Polyurethane Polymers

    PubMed Central

    Lackner, Juergen M.; Waldhauser, Wolfgang; Hartmann, Paul; Bruckert, Franz; Weidenhaupt, Marianne; Major, Roman; Sanak, Marek; Wiesinger, Martin; Heim, Daniel

    2012-01-01

    Biocompatibility improvements for blood contacting materials are of increasing interest for implanted devices and interventional tools. The current study focuses on inorganic (titanium, titanium nitride, titanium oxide) as well as diamond-like carbon (DLC) coating materials on polymer surfaces (thermoplastic polyurethane), deposited by magnetron sputtering und pulsed laser deposition at room temperature. DLC was used pure (a-C:H) as well as doped with silicon, titanium, and nitrogen + titanium (a-C:H:Si, a-C:H:Ti, a-C:H:N:Ti). In-vitro testing of the hemocompatibility requires mandatory dynamic test conditions to simulate in-vivo conditions, e.g., realized by a cone-and-plate analyzer. In such tests, titanium- and nitrogen-doped DLC and titanium nitride were found to be optimally anti-thrombotic and better than state-of-the-art polyurethane polymers. This is mainly due to the low tendency to platelet microparticle formation, a high content of remaining platelets in the whole blood after testing and low concentration of platelet activation and aggregation markers. Comparing this result to shear-flow induced cell motility tests with e.g., Dictostelium discoideum cell model organism reveals similar tendencies for the investigated materials. PMID:24955532

  15. Hemocompatibility of Inorganic Physical Vapor Deposition (PVD) Coatings on Thermoplastic Polyurethane Polymers.

    PubMed

    Lackner, Juergen M; Waldhauser, Wolfgang; Hartmann, Paul; Bruckert, Franz; Weidenhaupt, Marianne; Major, Roman; Sanak, Marek; Wiesinger, Martin; Heim, Daniel

    2012-01-01

    Biocompatibility improvements for blood contacting materials are of increasing interest for implanted devices and interventional tools. The current study focuses on inorganic (titanium, titanium nitride, titanium oxide) as well as diamond-like carbon (DLC) coating materials on polymer surfaces (thermoplastic polyurethane), deposited by magnetron sputtering und pulsed laser deposition at room temperature. DLC was used pure (a-C:H) as well as doped with silicon, titanium, and nitrogen + titanium (a-C:H:Si, a-C:H:Ti, a-C:H:N:Ti). In-vitro testing of the hemocompatibility requires mandatory dynamic test conditions to simulate in-vivo conditions, e.g., realized by a cone-and-plate analyzer. In such tests, titanium- and nitrogen-doped DLC and titanium nitride were found to be optimally anti-thrombotic and better than state-of-the-art polyurethane polymers. This is mainly due to the low tendency to platelet microparticle formation, a high content of remaining platelets in the whole blood after testing and low concentration of platelet activation and aggregation markers. Comparing this result to shear-flow induced cell motility tests with e.g., Dictostelium discoideum cell model organism reveals similar tendencies for the investigated materials. PMID:24955532

  16. Thermal conductivity of PVD TiAlN films using pulsed photothermal reflectance technique

    NASA Astrophysics Data System (ADS)

    Ding, Xing-Zhao; Samani, M. K.; Chen, George

    2010-11-01

    In the present work, we have measured thermal-conductivity of industrial thin film TiAlN with a thickness of around 3 μm. These films are used in machining industry for cutting tools in order to increase their service life. A series of TiAlN coating with a different Al/Ti atomic ratio were deposited on Fe-304 stainless steel (AISI304) substrate by a lateral rotating cathode arc process. The samples were then coated with a 0.8 μm gold layer on top by magnetron sputtering. We present the thermal-conductivity measurement of these samples using pulsed photothermal reflectance (PPR) technique at room temperature. The thermal conductivity of the pure TiN coating is about 11.9 W/mK. A significant decrease in thermal conductivity was found with increasing Al/Ti atomic ratio. A minimum thermal conductivity of about 4.63 W/mK was obtained at the Al/Ti atomic ratio of around 0.72.

  17. Geometrical Aspects of a Hollow-cathode Magnetron (HCM)

    SciTech Connect

    Cohen, Samuel, A.; Wang, Zhehui

    1998-11-01

    A hollow-cathode magnetron (HCM), built by surrounding a planar sputtering-magnetron cathode with a hollow-cathode structure (HCS), is operable at substantially lower pressures than its planar-magnetron counterpart. We have studied the dependence of magnetron operational parameters on the inner diameter D and length L of a cylindrical HCS. Only when L is greater than L sub zero, a critical length, is the HCM operable in the new low-pressure regime. The critical length varies with HCS inner diameter D. Explanations of the lower operational pressure regime, critical length, and plasma shape are proposed and compared with a one-dimension diffusion model for energetic or primary electron transport. At pressures above 1 mTorr, an electron-impact ionization model with Bohm diffusion at a temperature equivalent to one-half the primary electron energy and with an ambipolar constraint can explain the ion-electron pair creation required to sustain the discharge. The critical length L sub zero is determined by the magnetization length of the primary electrons.

  18. The target heating influence on the reactive magnetron sputtering process

    NASA Astrophysics Data System (ADS)

    Bondarenko, A.; Kolomiytsev, A.; Shapovalov, V.

    2016-07-01

    A physicochemical model for the reactive magnetron sputtering of a “hot” target is described in this paper. The system consisting of eight algebraic equations was solved for a tantalum target sputtered in an O2 environment. It was established that the hysteresis effect disappears with the increase of the ion current density.

  19. Contributions to the velocity spread of magnetron injection guns

    SciTech Connect

    Danly, B.G.; Kimura, T.; Kreischer, K.E.

    1995-12-31

    Various contributions to the velocity spread in magnetron injection guns for gyrotron applications have been studied, including the effects of misalignments, field errors, and cathode surface roughness. The net result of these effects is a substantial increase in spread over the ballistic spread usually calculated with typical gun codes.

  20. Extracytoplasmic Function (ECF) Sigma Factor Gene Regulation in Pseudomonas syringae: Integrated Molecular and Computational Characterization of PvdS-Regulated Promoters

    Technology Transfer Automated Retrieval System (TEKTRAN)

    The extracytoplasmic function (ECF) sigma factor PvdS regulates the expression of genes required for the biosynthesis and transport of pyoverdine, a siderophore that functions in iron acquisition. The production of pyoverdine is a distinctive trait of the fluorescent pseudomonads and the regulation ...

  1. Hysteresis behavior during reactive magnetron sputtering of Al{sub 2}O{sub 3} using a rotating cylindrical magnetron

    SciTech Connect

    Depla, D.; Haemers, J.; Buyle, G.; Gryse, R. de

    2006-07-15

    Rotating cylindrical magnetrons are used intensively on industrial scale. A rotating cylindrical magnetron on laboratory scale makes it possible to study this deposition technique in detail and under well controlled conditions. Therefore, a small scale rotating cylindrical magnetron was designed and used to study the influence of the rotation speed on the hysteresis behavior during reactive magnetron sputtering of aluminum in Ar/O{sub 2} in dc mode. This study reveals that the hysteresis shifts towards lower oxygen flows when the rotation speed of the target is increased, i.e., target poisoning occurs more readily when the rotation speed is increased. The shift is more pronounced for the lower branch of the hysteresis loop than for the upper branch of the hysteresis. This behavior can be understood qualitatively. The results also show that the oxidation mechanism inside the race track is different from the oxidation mechanism outside the race track. Indeed, outside the race track the oxidation mechanism is only defined by chemisorption while inside the race track reactive ion implantation will also influence the oxidation mechanism.

  2. Highly selective etching of silicon nitride to physical-vapor-deposited a-C mask in dual-frequency capacitively coupled CH{sub 2}F{sub 2}/H{sub 2} plasmas

    SciTech Connect

    Kim, J. S.; Kwon, B. S.; Heo, W.; Jung, C. R.; Park, J. S.; Shon, J. W.; Lee, N.-E.

    2010-01-15

    A multilevel resist (MLR) structure can be fabricated based on a very thin amorphous carbon (a-C) layer ( congruent with 80 nm) and Si{sub 3}N{sub 4} hard-mask layer ( congruent with 300 nm). The authors investigated the selective etching of the Si{sub 3}N{sub 4} layer using a physical-vapor-deposited (PVD) a-C mask in a dual-frequency superimposed capacitively coupled plasma etcher by varying the process parameters in the CH{sub 2}F{sub 2}/H{sub 2}/Ar plasmas, viz., the etch gas flow ratio, high-frequency source power (P{sub HF}), and low-frequency source power (P{sub LF}). They found that under certain etch conditions they obtain infinitely high etch selectivities of the Si{sub 3}N{sub 4} layers to the PVD a-C on both the blanket and patterned wafers. The etch gas flow ratio played a critical role in determining the process window for infinitely high Si{sub 3}N{sub 4}/PVD a-C etch selectivity because of the change in the degree of polymerization. The etch results of a patterned ArF photoresisit/bottom antireflective coating/SiO{sub x}/PVD a-C/Si{sub 3}N{sub 4} MLR structure supported the idea of using a very thin PVD a-C layer as an etch-mask layer for the Si{sub 3}N{sub 4} hard-mask pattern with a pattern width of congruent with 80 nm and high aspect ratio of congruent with 5.

  3. Low pressure hand made PVD system for high crystalline metal thin film preparation in micro-nanometer scale

    NASA Astrophysics Data System (ADS)

    Rosikhin, Ahmad; Hidayat, Aulia Fikri; Marimpul, Rinaldo; Syuhada, Ibnu; Winata, Toto

    2016-02-01

    High crystalline metal thin film preparation in application both for catalyst substrate or electrode in any electronic devices always to be considered in material functional material research and development. As a substrate catalyst, this metal take a role as guidance for material growth in order to resulted in proper surface structure although at the end it will be removed via etching process. Meanwhile as electrodes, it will dragging charges to be collected inside. This brief discussion will elaborate general fundamental principle of physical vapor deposition (PVD) system for metal thin film preparation in micro-nanometer scale. The influence of thermodynamic parameters and metal characteristic such as melting point and particle size will be elucidated. Physical description of deposition process in the chamber can be simplified by schematic evaporation phenomena which is supported by experimental measurement such as SEM and XRD.

  4. Microstructure evolution during annealing of TiAl/NiCoCrAl multilayer composite prepared by EB-PVD

    SciTech Connect

    Zhang, Rubing; Zhang, Deming; Chen, Guiqing; Wang, Yuesheng

    2014-07-01

    TiAl/NiCoCrAl laminate composite sheet with a thickness of 0.4–0.6 mm as well as a dimension of 150 mm × 100 mm was fabricated successfully by using electron beam physical vapor deposition (EB-PVD) method. The annealing treatment was processed at 1123 and 1323 K for 3 h in a high vacuum atmosphere, respectively. The phase composition and microstructure of TiAl/NiCoCrAl microlaminated sheet have been analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Based on the sheet characterization and results of the microstructure evolution during annealing treatment process, the diffusion mechanism of interfacial reaction in TiAl/NiCoCrAl microlaminate was investigated and discussed.

  5. Structural features and gas tightness of EB-PVD 1Ce10ScSZ electrolyte films

    NASA Astrophysics Data System (ADS)

    Andrzejczuk, M.; Vasylyev, O.; Brychevskyi, M.; Dubykivskyi, L.; Smirnova, A.; Lewandowska, M.; Kurzydłowski, K. J.; Steinberger-Wilckens, R.; Mertens, J.; Haanappel, V.

    2012-09-01

    The structure of Ceria doped Scandia Stabilized Zirconia (1Ce10ScSZ) electrolyte film deposited by EB-PVD (Electron Beam-Physical Vapour Deposition) technique on NiO-ZrO2 substrate was characterized by electron microscopy. The highly porous substrate was densely covered by deposited film without any spallation. The produced electrolyte layer was of a columnar structure with bushes, bundles of a diameter up to 30 μm and diverse height. Between the columns, delamination cracks of few microns length were visible. The annealing of zirconia film at 1000 °C resulted in its densification. The columnar grains and delaminating cracks changed their shape into a bit rounded. High magnification studies revealed nanopores 5-60 nm formed along the boundaries of the columnar grains during annealing. High-quality contacts between the electrolyte film and anode substrate ensured good conductivity of the electrolyte film and high efficiency of SOFC.

  6. Microwave Plasma Excitation Using Cylindrical Cavity with Dual Injection

    NASA Astrophysics Data System (ADS)

    Hasegawa, Yuichi; Nakamura, Keiji; Park, Soonam; Kobayashi, Satoru; Sugai, Hideo; Chubu University Team; Applied Materials Team; Nagoya Industrial Science Research Institute Team

    2015-09-01

    Large high-density plasmas have been generated by injecting magnetron-based microwaves radiated from slots cut on a wall of a rectangular or coaxial waveguide. However, a standing structural microwave in the waveguide often causes non-uniformity of plasma density. To minimize such inhomogeneity excited by the conventional waveguide, we adopt a resonant cylindrical cavity combined with a solid-state microwave amplifier. Microwave is injected into the cavity from two ports azimuthally apart by 90 degrees to each other (dual injection). FDTD simulations are performed for a TE111 mode resonant cavity excited by single or dual microwave injection. In the case of the dual injection with a phase difference of π/2, the wave field azimuthally rotates in the cavity, and hence the slots cut on a cavity bottom wall launch travelling waves, thus minimizing the azimuthal inhomogeneity of the resultant plasma. 40-cm-diameter plasmas are experimentally generated in argon at 0.1 ~ 5 Torr with microwaves of 2.4-2.5GHz and 400W. Threshold powers for plasma ignition are much less in dual injection than those in single injection. Optical emission images of the cylindrical plasmas show that the plasma uniformity is considerably improved in dual injection, particularly at high-pressure and low-power.

  7. Comprehensive computer model for magnetron sputtering. II. Charged particle transport

    SciTech Connect

    Jimenez, Francisco J. Dew, Steven K.; Field, David J.

    2014-11-01

    Discharges for magnetron sputter thin film deposition systems involve complex plasmas that are sensitively dependent on magnetic field configuration and strength, working gas species and pressure, chamber geometry, and discharge power. The authors present a numerical formulation for the general solution of these plasmas as a component of a comprehensive simulation capability for planar magnetron sputtering. This is an extensible, fully three-dimensional model supporting realistic magnetic fields and is self-consistently solvable on a desktop computer. The plasma model features a hybrid approach involving a Monte Carlo treatment of energetic electrons and ions, along with a coupled fluid model for thermalized particles. Validation against a well-known one-dimensional system is presented. Various strategies for improving numerical stability are investigated as is the sensitivity of the solution to various model and process parameters. In particular, the effect of magnetic field, argon gas pressure, and discharge power are studied.

  8. Microwave beamed power technology improvement. [magnetrons and slotted waveguide arrays

    NASA Technical Reports Server (NTRS)

    Brown, W. C.

    1980-01-01

    The magnetron directional amplifier was tested for (1) phase shift and power output as a function of gain, anode current, and anode voltage, (2) background noise and harmonics in the output, (3) long life potential of the magnetron cathode, and (4) high operational efficiency. Examples of results were an adequate range of current and voltage over which 20 dB of amplification could be obtained, spectral noise density 155 dB below the carrier, 81.7% overall efficiency, and potential cathode life of 50 years in a design for solar power satellite use. A fabrication method was used to fabricate a 64 slot, 30 in square slotted waveguide array module from 0.020 in thick aluminum sheet. The test results on the array are discussed.

  9. Linear ion source with magnetron hollow cathode discharge

    SciTech Connect

    Tang, D.L.; Pu, S.H.; Wang, L.S.; Qiu, X.M.; Chu, Paul K.

    2005-11-15

    A linear ion source with magnetron hollow cathode discharge is described in this paper. The linear ion source is based on an anode layer thruster with closed-drift electrons that move in a closed path in the ExB fields. An open slit configuration is designed at the end of the ion source for the extraction of the linear ion beam produced by the magnetron hollow cathode discharge. The special configurations enable uninterrupted and expanded operation with oxygen as well as other reactive gases because of the absence of an electron source in the ion source. The ion current density and uniformity were experimentally evaluated. Using the ion source, surface modification was conducted on polyethylene terephthalate polymer films to improve the adhesion strength with ZnS coatings.

  10. Equilibrium and Stability of the Brillouin Flow in Inverted Magnetron

    NASA Astrophysics Data System (ADS)

    Simon, David; Lau, Yue Ying; Franzi, Matt; Greening, Geoff; Gilgenbach, Ronald; Marhdahl, Peter; Hoff, Brad; Luginsland, John

    2012-10-01

    One embodiment of the novel recirculating planar magnetron, RPM [1] utilizes an inverted configuration for fast startup. While the negative mass behavior on the thin electron layer model [2] is well-known for the inverted magnetron, the corresponding behavior for the equilibrium Brillouin flow [3] is an open question. Simulations using the particle-in-cell codes ICEPIC and/or MAGIC will be performed and compared to the solution to the eigenvalue problem that governs the stability of Brillouin flow, leading to a fundamental study of the flow's negative, positive, and infinite mass properties. Research supported by AFOSR (grant#: FA9550-10-1-0104), AFRL, and L-3 Communications Electron Devices. [4pt] [1] R. M. Gilgenbach, et.al., IEEE Trans. Plasma Sci. 39, 980 (2011); Also patent pending.[0pt] [2] D. M. French, et al., Appl. Phys. Lett. 97, 111501 (2010).[0pt] [3] D. Simon, et al., Phys. Plasmas 19, 043103 (2012).

  11. Hollow target magnetron-sputter-type solid material ion source.

    PubMed

    Sasaki, D; Ieki, S; Kasuya, T; Wada, M

    2012-02-01

    A thin-walled aluminum (Al) hollow electrode has been inserted into an ion source to serve as an electrode for a radio frequency magnetron discharge. The produced plasma stabilized by argon (Ar) gas sputters the Al electrode to form a beam of Al(+) and Ar(+) ions. The total beam current extracted through a 3 mm diameter extraction hole has been 50 μA, with the Al(+) ion beam occupying 30% of the total beam current. PMID:22380320

  12. Magnetron sputtering in rigid optical solar reflectors production

    NASA Astrophysics Data System (ADS)

    Asainov, O. Kh; Bainov, D. D.; Krivobokov, V. P.; Sidelev, D. V.

    2016-07-01

    Magnetron sputtering was applied to meet the growing need for glass optical solar reflectors. This plasma method provided more uniform deposition of the silver based coating on glass substrates resulted in decrease of defective reflectors fraction down to 5%. For instance, such parameter of resistive evaporation was of 30%. Silver film adhesion to glass substrate was enhanced with indium tin oxide sublayer. Sunlight absorption coefficient of these rigid reflectors was 0.081-0.083.

  13. Optical properties of magnetron-sputtered and rolled aluminum

    SciTech Connect

    Van Gils, S.; Dimogerontakis, Th.; Buytaert, G.; Stijns, E.; Terryn, H.; Skeldon, P.; Thompson, G.E.; Alexander, M.R.

    2005-10-15

    The optical properties of magnetron-sputtered aluminum and AA1050 aluminum alloy sheet have been examined qualitatively using total reflectance and quantitatively by means of visible spectroscopic ellipsometry (VISSE). Significant changes in reflectance and optical constants are observed, which are related to the incorporation of oxide in the aluminum bulk. The role of such oxide was determined by VISSE using the Bruggeman effective-medium approximation, with the findings validated by x-ray photoelectron spectroscopy and Rutherford backscattering spectroscopy.

  14. Deposition of copper coatings in a magnetron with liquid target

    SciTech Connect

    Tumarkin, A. V. Kaziev, A. V.; Kolodko, D. V.; Pisarev, A. A.; Kharkov, M. M.; Khodachenko, G. V.

    2015-12-15

    Copper coatings were deposited on monocrystalline Si substrates using a magnetron discharge with a liquid cathode in the metal vapour plasma. During the deposition, the bias voltage in the range from 0 V to–400 V was applied to the substrate. The prepared films were investigated by a scanning electron microscope, and their adhesive properties were studied using a scratch tester. It was demonstrated that the adhesion of the deposited films strongly depends on the bias voltage and varies in a wide range.

  15. Magnetron co-sputtering system for coating ICF targets

    SciTech Connect

    Hsieh, E.J.; Meyer, S.F.; Halsey, W.G.; Jameson, G.T.; Wittmayer, F.J.

    1981-09-09

    Fabrication of Inertial Confinement Fusion (ICF) targets requires deposition of various types of coatings on microspheres. The mechanical strength, and surface finish of the coatings are of concern in ICF experiments. The tensile strength of coatings can be controlled through grain refinement, selective doping and alloy formation. We have constructed a magnetron co-sputtering system to produce variable density profile coatings with high tensile strength on microspheres.

  16. Calcium phosphate coatings produced by radiofrequency magnetron sputtering method

    NASA Astrophysics Data System (ADS)

    Bolbasov, E. N.; Zheravin, A. A.; Klimov, I. A.; Kulbakin, D. E.; Perelmuter, V. M.; Tverdokhlebov, S. I.; Cherdyntseva, N. V.; Choinzonov, E. L.

    2016-08-01

    Calcium phosphate coatings on titanium implants surface, produced by radio frequency (RF) magnetron sputtering method with hydroxyapatite solid target were investigated. It was found that produced coatings are calcium deficient compared to stoichiometric hydroxyapatite. The surface of the coatings is highly rough at the nanoscale and highly elastic. In vivo experiments on rats revealed that titanium implants with the calcium phosphate coatings do not cause negative tissue reaction after 6 months incubation period.

  17. High Peak Power Gyroklystron with an Inverted Magnetron Injection Gun

    NASA Astrophysics Data System (ADS)

    Read, Michael; Neilson, Jeff; Borchard, Philipp; Ives, Lawrence; Lawson, Wes

    2006-01-01

    This paper describes the design of a 25 MW, 30 GHz gyroklystron amplifier based on a coaxial RF structure. The design includes an inverted magnetron injection gun (MIG) for positioning and cooling the inner conductor. The gun produces a very low spread beam that contributes to a device efficiency of 54%. Details are given of the gun, RF structure, input and output couplers and collector.

  18. Deposition of copper coatings in a magnetron with liquid target

    NASA Astrophysics Data System (ADS)

    Tumarkin, A. V.; Kaziev, A. V.; Kolodko, D. V.; Pisarev, A. A.; Kharkov, M. M.; Khodachenko, G. V.

    2015-12-01

    Copper coatings were deposited on monocrystalline Si substrates using a magnetron discharge with a liquid cathode in the metal vapour plasma. During the deposition, the bias voltage in the range from 0 V to-400 V was applied to the substrate. The prepared films were investigated by a scanning electron microscope, and their adhesive properties were studied using a scratch tester. It was demonstrated that the adhesion of the deposited films strongly depends on the bias voltage and varies in a wide range.

  19. Hollow target magnetron-sputter-type solid material ion source

    SciTech Connect

    Sasaki, D.; Ieki, S.; Kasuya, T.; Wada, M.

    2012-02-15

    A thin-walled aluminum (Al) hollow electrode has been inserted into an ion source to serve as an electrode for a radio frequency magnetron discharge. The produced plasma stabilized by argon (Ar) gas sputters the Al electrode to form a beam of Al{sup +} and Ar{sup +} ions. The total beam current extracted through a 3 mm diameter extraction hole has been 50 {mu}A, with the Al{sup +} ion beam occupying 30% of the total beam current.

  20. Theoretical investigation of the dielectric-filled relativistic magnetron

    NASA Astrophysics Data System (ADS)

    Wang, Xiaoyu; Fan, Yuwei; Shu, Ting; Shi, Difu

    2016-01-01

    The fundamental mode frequency of a dielectric-filled relativistic magnetron is studied theoretically by the method of the equivalent circuit, and an exact fundamental mode frequency formula is derived. To prove the validity of the theoretical formula, simulation investigation is performed. The simulation results agree well with the theoretical formula, and the relative error does not exceed 3%. The comparative results verify the creditability of the theoretical formula.

  1. Passive mode control in the recirculating planar magnetron

    NASA Astrophysics Data System (ADS)

    Franzi, Matthew; Gilgenbach, Ronald; Lau, Y. Y.; Hoff, Brad; Greening, Geoff; Zhang, Peng

    2013-03-01

    Preliminary experiments of the recirculating planar magnetron microwave source have demonstrated that the device oscillates but is susceptible to intense mode competition due, in part, to poor coupling of RF fields between the two planar oscillators. A novel method of improving the cross-oscillator coupling has been simulated in the periodically slotted mode control cathode (MCC). The MCC, as opposed to a solid conductor, is designed to electromagnetically couple both planar oscillators by allowing for the propagation of RF fields and electrons through resonantly tuned gaps in the cathode. Using the MCC, a 12-cavity anode block with a simulated 1 GHz and 0.26 c phase velocity (where c is the speed of light) was able to achieve in-phase oscillations between the two sides of the device in as little as 30 ns. An analytic study of the modified resonant structure predicts the MCC's ability to direct the RF fields to provide tunable mode separation in the recirculating planar magnetron. The self-consistent solution is presented for both the degenerate even (in phase) and odd (180° out of phase) modes that exist due to the twofold symmetry of the planar magnetrons.

  2. Passive mode control in the recirculating planar magnetron

    SciTech Connect

    Franzi, Matthew; Gilgenbach, Ronald; Lau, Y. Y.; Greening, Geoff; Zhang, Peng; Hoff, Brad

    2013-03-15

    Preliminary experiments of the recirculating planar magnetron microwave source have demonstrated that the device oscillates but is susceptible to intense mode competition due, in part, to poor coupling of RF fields between the two planar oscillators. A novel method of improving the cross-oscillator coupling has been simulated in the periodically slotted mode control cathode (MCC). The MCC, as opposed to a solid conductor, is designed to electromagnetically couple both planar oscillators by allowing for the propagation of RF fields and electrons through resonantly tuned gaps in the cathode. Using the MCC, a 12-cavity anode block with a simulated 1 GHz and 0.26 c phase velocity (where c is the speed of light) was able to achieve in-phase oscillations between the two sides of the device in as little as 30 ns. An analytic study of the modified resonant structure predicts the MCC's ability to direct the RF fields to provide tunable mode separation in the recirculating planar magnetron. The self-consistent solution is presented for both the degenerate even (in phase) and odd (180 Degree-Sign out of phase) modes that exist due to the twofold symmetry of the planar magnetrons.

  3. Particle-in-Cell (PIC) simulation of CW industrial heating magnetron.

    PubMed

    Andreev, Andrey D; Hendricks, Kyle J

    2010-01-01

    Modern CW industrial heating magnetrons are capable for producing as high as 300 kW of continuous-wave microwave power at frequencies around 900 MHz and are sold commercially [Wynn et al., 2004]. However, to utilize these magnetrons in some specific research and scientific applications being of interest for the Air Force, the necessary adaptation and redesign are required. It means that the detailed knowledge of principles of their operation and full understanding of how the changes of the design parameters affect their operational characteristics are necessary. We have developed and tested computer model of a 10-vane high-power strapped magnetron, which geometrical dimensions and design parameters are close to those of the California Tube Laboratory's commercially produced CWM-75/100L tube. The computer model is built by using the 3-D Improved Concurrent Electromagnetic Particle-in-Cell (ICEPIC) code. Simulations of the strapped magnetron operation are performed and the following operational characteristics are obtained during the simulation: frequency and mode of magnetron oscillations, output microwave power and efficiency of magnetron operation, anode current and anode-cathode voltage dynamics. The developed computer model of a non-relativistic high-power strapped magnetron may be used by the industrial magnetron community for designing following generations of the CW industrial heating high-power magnetrons. PMID:21721323

  4. Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films

    SciTech Connect

    Ehiasarian, A. P.; Vetushka, A.; Gonzalvo, Y. Aranda; Safran, G.; Szekely, L.; Barna, P. B.

    2011-05-15

    HIPIMS (High Power Impulse Magnetron Sputtering) discharge is a new PVD technology for the deposition of high-quality thin films. The deposition flux contains a high degree of metal ionization and nitrogen dissociation. The microstructure of HIPIMS-deposited nitride films is denser compared to conventional sputter technologies. However, the mechanisms acting on the microstructure, texture and properties have not been discussed in detail so far. In this study, the growth of TiN by HIPIMS of Ti in mixed Ar and N{sub 2} atmosphere has been investigated. Varying degrees of metal ionization and nitrogen dissociation were produced by increasing the peak discharge current (I{sub d}) from 5 to 30 A. The average power was maintained constant by adjusting the frequency. Mass spectrometry measurements of the deposition flux revealed a high content of ionized film-forming species, such as Ti{sup 1+}, Ti{sup 2+} and atomic nitrogen N{sup 1+}. Ti{sup 1+} ions with energies up to 50 eV were detected during the pulse with reducing energy in the pulse-off times. Langmuir probe measurements showed that the peak plasma density during the pulse was 3 x 10{sup 16} m{sup -3}. Plasma density, and ion flux ratios of N{sup 1+}: N{sub 2}{sup 1+} and Ti{sup 1+}: Ti{sup 0} increased linearly with peak current. The ratios exceeded 1 at 30 A. TiN films deposited by HIPIMS were analyzed by X-ray diffraction, and transmission electron microscopy. At high I{sub d}, N{sup 1+}: N{sub 2}{sup 1+} > 1 and Ti{sup 1+}: Ti{sup 0} > 1 were produced; a strong 002 texture was present and column boundaries in the films were atomically tight. As I{sub d} reduced and N{sup 1+}: N{sub 2}{sup 1+} and Ti{sup 1+}: Ti{sup 0} dropped below 1, the film texture switched to strong 111 with a dense structure. At very low I{sub d}, porosity between columns developed. The effects of the significant activation of the deposition flux observed in the HIPIMS discharge on the film texture, microstructure, morphology and

  5. Lithium ion conducting PVdF-HFP composite gel electrolytes based on N-methoxyethyl- N-methylpyrrolidinium bis(trifluoromethanesulfonyl)-imide ionic liquid

    NASA Astrophysics Data System (ADS)

    Ferrari, S.; Quartarone, E.; Mustarelli, P.; Magistris, A.; Fagnoni, M.; Protti, S.; Gerbaldi, C.; Spinella, A.

    Blends of PVdF-HFP and ionic liquids (ILs) are interesting for application as electrolytes in plastic Li batteries. They combine the advantages of the gel polymer electrolytes (GPEs) swollen by conventional organic liquid electrolytes with the nonflammability, and high thermal and electrochemical stability of ILs. In this work we prepared and characterized PVdF-HFP composite membranes swollen with a solution of LiTFSI in ether-functionalized pyrrolidinium-imide ionic liquid (PYRA 12O1TFSI). The membranes were filled in with two different types of silica: (i) mesoporous SiO 2 (SBA-15) and (ii) a commercial nano-size one (HiSil™ T700). The ionic conductivity and the electrochemical properties of the gel electrolytes were studied in terms of the nature of the filler. The thermal and the transport properties of the composite membranes are similar. In particular, room temperature ionic conductivities higher than 0.25 mS cm -1 are easily obtained at defined filler contents. However, the mesoporous filler guarantees higher lithium transference numbers, a more stable electrochemical interface and better cycling performances. Contrary to the HiSil™-based membrane, the Li/LiFePO 4 cells with PVdF-HFP/PYRA 12O1TFSI-LiTFSI films containing 10 wt% of SBA-15 show good charge/discharge capacity, columbic efficiency close to unity, and low capacity losses at medium C-rates during 180 cycles.

  6. [Standardized testing of bone implant surfaces with an osteoblast cell culture cyste. III. PVD hard coatings and Ti6Al4V].

    PubMed

    Steinert, A; Hendrich, C; Merklein, F; Rader, C P; Schütze, N; Thull, R; Eulert, J

    2000-12-01

    The effect of titanium-based PVD coatings and a titanium alloy on the proliferation and differentiation of osteoblasts was investigated using a standardised cell culture system. Human fetal osteoblasts (hFOB 1.19) were cultured on titanium-niobium-nitride ([Ti,Nb]N), titanium-niobium-oxy-nitride coatings ([Ti,Nb]ON) and titanium-aluminium-vanadium alloy (Ti6Al4V) for 17 days. Cell culture polystyrene (PS) was used as reference. For the assessment of proliferation, the numbers and viability of the cells were determined, while alkaline phosphatase activity, collagen I and osteocalcin synthesis served as differentiation parameters. On the basis of the cell culture experiments, a cytotoxic effect of the materials can be excluded. In comparison with the other test surfaces, [Ti,Nb]N showed greater cell proliferation. The [Ti,Nb]N coating was associated with the highest level of osteocalcin production, while all other differentiation parameters were identical on all three surfaces. The test system described reveals the influence of PVD coatings on the osteoblast differentiation cycle. The higher oxygen content of the [Ti,Nb]ON surface does not appear to have any positive impact on cell proliferation. The excellent biocompatibility of the PVD coatings is confirmed by in vivo findings. The possible use of these materials in the fields of osteosynthesis and articular surfaces is still under discussion. PMID:11194641

  7. Dual Wavelength Lasers

    NASA Technical Reports Server (NTRS)

    Walsh, Brian M.

    2010-01-01

    Dual wavelength lasers are discussed, covering fundamental aspects on the spectroscopy and laser dynamics of these systems. Results on Tm:Ho:Er:YAG dual wavelength laser action (Ho at 2.1 m and Er at 2.9 m) as well as Nd:YAG (1.06 and 1.3 m) are presented as examples of such dual wavelength systems. Dual wavelength lasers are not common, but there are criteria that govern their behavior. Based on experimental studies demonstrating simultaneous dual wavelength lasing, some general conclusions regarding the successful operation of multi-wavelength lasers can be made.

  8. Synthesizing mixed phase titania nanocomposites with enhanced photoactivity and redshifted photoresponse by reactive DC magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Chen, Le

    Recent work points out the importance of the solid-solid interface in explaining the high photoactivity of mixed phase TiO2 catalysts. The goal of this research was to probe the synthesis-structure-function relationships of the solid-solid interfaces created by the reactive direct current (DC) magnetron sputtering of titanium dioxide. I hypothesize that the reactive DC magnetron sputtering is a useful method for synthesizing photo-catalysts with unique structure including solid-solid interfaces and surface defects that are associated with enhanced photoreactivity as well as a photoresponse shifted to longer wavelengths of light. I showed that sputter deposition provides excellent control of the phase and interface formation as well as the stoichiometry of the films. I explored the effects exerted by the process parameters of pressure, oxygen partial pressure, target power, substrate bias (RF), deposition incidence angle, and post annealing treatment on the structural and functional characteristics of the catalysts. I have successfully made pure and mixed phase TiO2 films. These films were characterized with UV-Vis, XPS, AFM, SEM, TEM, XRD and EPR, to determine optical properties, elemental stoichiometry, surface morphology, phase distribution and chemical coordination. Bundles of anatase-rutile nano-columns having high densities of dual-scale of interfaces among and within the columns are fabricated. Photocatalytic performance of the sputtered films as measured by the oxidation of the pollutant, acetaldehyde, and the reduction of CO2 for fuel (CH4) production was compared (normalized for surface area) to that of mixed phase TiO2 fabricated by other methods, including flame hydrolysis powders, and solgel deposited TiO 2 films. The sputtered mixed phase materials were far superior to the commercial standard (Degussa P25) and solgel TiO2 based on gas phase reaction of acetaldehyde oxidation under UV light and CO2 reduction under both UV and visible illuminations. The

  9. Particle contamination formation and detection in magnetron sputtering processes

    SciTech Connect

    Selwyn, G.S.; Weiss, C.A.; Sequeda, F.; Huang, C.

    1996-10-01

    Defects caused by particulate contamination are an important concern in the fabrication of thin film products. Often, magnetron sputtering processes are used for this purpose. Particle contamination can cause electrical shorting, pin holes, problems with photolithography, adhesion failure, as well as visual and cosmetic defects. Particle contamination generated during thin film processing can be detected using laser light scattering, a powerful diagnostic technique that provides real-time, {ital in-situ} imaging of particles > 0.3 {mu}m in diameter. Using this technique, the causes, sources and influences on particles in plasma and non-plasma and non-plasma processes may be independently evaluated and corrected. Several studies employing laser light scattering have demonstrated both homogeneous and heterogeneous causes of particle contamination. In this paper, we demonstrate that the mechanisms for particle generation, transport and trapping during magnetron sputter deposition are different from the mechanisms reported in previously studied plasma etch processes. During magnetron sputter deposition, one source of particle contamination is linked to portions of the sputtering target surface exposed to weaker plasma density. In this region, film redeposition is followed by filament or nodule growth and enhanced trapping which increases filament growth. Eventually the filaments effectively ``short circuit`` the sheath, causing high currents to flow through these features. This, in turn, causes heating failure of the filament fracturing and ejecting the filaments into the plasma and onto the substrate. Evidence of this effect has been observed in semiconductor (IC) fabrication and storage disk manufacturing. Discovery of this mechanism in both technologies suggests that this mechanism may be universal to many sputtering processes.

  10. Plasma regimes in high power pulsed magnetron sputtering

    NASA Astrophysics Data System (ADS)

    de Los Arcos, Teresa

    2013-09-01

    High Power Pulsed Magnetron Sputtering (HPPMS) is a relatively recent variation of magnetron sputtering where high power is applied to the magnetron in short pulses. The result is the formation of dense transient plasmas with a high fraction of ionized species, ideally leading to better control of film growth through substrate bias. However, the broad range of experimental conditions accessible in pulsed discharges results in bewildering variations in current and voltage pulse shapes, pulse power densities, etc, which represent different discharge behaviors, making it difficult to identify relevant deposition conditions. The complexity of the plasma dynamics is evident. Within each pulse, plasma characteristics such as plasma composition, density, gas rarefaction, spatial distribution, degree of self-sputtering, etc. vary with time. A recent development has been the discovery that the plasma emission can self-organize into well-defined regions of high and low plasma emissivity above the racetrack (spokes), which rotate in the direction given by the E ×B drift and that significantly influence the transport mechanisms in HPPMS. One seemingly universal characteristic of HPPMS plasmas is the existence of well defined plasma regimes for different power ranges. These regimes are clearly differentiated in terms of plasma conductivity, plasma composition and spatial plasma self-organization. We will discuss the global characteristics of these regimes in terms of current-voltage characteristics, energy-resolved QMS and OES analysis, and fast imaging. In particular we will discuss how the reorganization of the plasma emission into spokes is associated only to specific regimes of high plasma conductivity. We will also briefly discuss the role of the target in shaping the characteristics of the HPPMS plasma, since sputtering is a surface-driven process. This work was supported by the Deutsche Forschungsgemeinschaft (DFG) within the framework of the SFB-TR87.

  11. PVD9902, a porcine vas deferens epithelial cell line that exhibits neurotransmitter-stimulated anion secretion and expresses numerous HCO3(-) transporters.

    PubMed

    Carlin, Ryan W; Sedlacek, Roger L; Quesnell, Rebecca R; Pierucci-Alves, Fernando; Grieger, David M; Schultz, Bruce D

    2006-06-01

    Epithelial ion transport disorders, including cystic fibrosis, adversely affect male reproductive function by nonobstructive mechanisms and by obstruction of the distal duct. Continuous cell lines that could be used to define ion transport mechanisms in this tissue are not readily available. In the present study, porcine vas deferens epithelial cells were isolated by standard techniques, and the cells spontaneously immortalized to form a porcine vas deferens epithelial cell line that we have titled PVD9902. Cells were maintained in continuous culture for >4 yr and 200 passages in a typical growth medium. Frozen stocks were generated, and thawed cells exhibited growth characteristics indistinguishable from their nonfrozen counterparts. Molecular and immunocytochemical studies confirmed the origin and epithelial nature of these cells. When seeded on permeable supports, PVD9902 cells grew as electrically tight (>6,000 ohms x cm2), confluent monolayers that responded to forskolin with an increase in short-circuit current (I(sc); 8 +/- 1 microA/cm2) that required Cl-, HCO3(-), and Na+, and was partially sensitive to bumetanide. mRNA was expressed for a number of anion transporters, including CFTR, electrogenic Na+-HCO3(-) cotransporter 1b (NBCe1b), downregulated in adenoma, pendrin, and Cl-/formate exchanger. Both forskolin and isoproterenol caused an increase in cellular cAMP levels. In addition, PVD9902 cell monolayers responded to physiological (i.e., adenosine, norepinephrine) and pharmacological [i.e., 5'-(N-ethylcarboxamido)adenosine, isoproterenol] agonists with increases in I(sc). Unlike their freshly isolated counterparts, however, PVD9902 cells did not respond to glucocorticoid exposure with an increase in amiloride-sensitive I(sc). RT-PCR analysis revealed the presence of both glucocorticoid and mineralocorticoid receptor mRNA as well as mRNA for the alpha- and gamma-subunits of the epithelia Na+ channels (alpha- and gamma-ENaC), but not beta

  12. The Magnetron Method for the Determination of e/m for Electrons: Revisited

    ERIC Educational Resources Information Center

    Azooz, A. A.

    2007-01-01

    Additional information concerning the energy distribution function of electrons in a magnetron diode valve can be extracted. This distribution function is a manifestation of the effect of space charge at the anode. The electron energy distribution function in the magnetron is obtained from studying the variation of the anode current with the…

  13. Lateral variation of target poisoning during reactive magnetron sputtering

    SciTech Connect

    Guettler, D.; Groetzschel, R.; Moeller, W.

    2007-06-25

    The reactive gas incorporation into a Ti sputter target has been investigated using laterally resolving ion beam analysis during dc magnetron deposition of TiN in an Ar/N{sub 2} atmosphere. At sufficiently low reactive gas flow, the nitrogen incorporation exhibits a pronounced lateral variation, with a lower areal density in the target racetrack compared to the target center and edge. The findings are reproduced by model calculations. In the racetrack, the balance of reactive gas injection and sputter erosion is shifted toward erosion. The injection of nitrogen is dominated by combined molecular adsorption and recoil implantation versus direct ion implantation.

  14. Simulation of the velocity spread in magnetron injection guns

    SciTech Connect

    Liu, C.; Antonsen, T.M. Jr.; Levush, B.

    1996-06-01

    The velocity spread associated with phase mixing due to dc space charge in a magnetron injection gun (MIG) is investigated. A simple model is introduced to describe the mixing process. Simulations are performed by using the results of the EGUN trajectory calculation for initial conditions at the entrance of the drift region. Results for a 170 GHz gun are obtained and compared with EGUN simulations. This new model provides a more accurate and efficient approach for analyzing the velocity spread due to mixing in MIG`s.

  15. Magnetron co-sputtering system for coating ICF targets

    SciTech Connect

    Hsieh, E.J.; Meyer, S.F.; Halsey, W.G.; Jameson, G.T.; Wittmayer, F.J.

    1981-12-09

    Fabrication of Inertial Confinement Fusion (ICF) targets requires deposition of various types of coatings on microspheres. The mechanical strength, and surface finish of the coatings are of concern in ICF experiments. The tensile strength of coatings can be controlled through grain refinement, selective doping and alloy formation. We have constructed a magnetron co-sputtering system to produce variable density profile coatings with high tensile strength on microspheres. The preliminary data on the properties of a Au-Cu binary alloy system by SEM and STEM analysis is presented.

  16. Discharge current modes of high power impulse magnetron sputtering

    SciTech Connect

    Wu, Zhongzhen Xiao, Shu; Ma, Zhengyong; Cui, Suihan; Ji, Shunping; Pan, Feng; Tian, Xiubo; Fu, Ricky K. Y.; Chu, Paul K.

    2015-09-15

    Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.

  17. Liner conformality in ionized magnetron sputter metal deposition processes

    SciTech Connect

    Hamaguchi, S.; Rossnagel, S.M.

    1996-07-01

    The conformality of thin metal films (liners) formed on high-aspect-ratio trench structures in ionized magnetron sputter deposition processes is studied numerically and experimentally. The numerical simulator (SHADE) used to predict the surface topography is based on the shock-tracking method for surface evolution. The simulation results are in good agreement with experimentally observed thin-film topography. It is shown that combination of direct deposition and trench-bottom resputtering results in good conformality of step coverages and the amount of the resputtering needed for the good conformality is almost independent of trench aspect ratios. {copyright} {ital 1996 American Vacuum Society}

  18. Characterization of Magnetron Sputtered Coatings by Pulsed Eddy Current Techniques

    SciTech Connect

    Mulligan, Chris; Lee Changqing; Danon, Yaron

    2005-04-09

    A method that uses induced pulsed eddy currents for characterization of thick magnetron sputtered Nb coatings on steel is presented in this paper. The objectives of this work are to develop a system for rapid quantitative nondestructive inspection of coatings as well as to determine the correlation between coating properties, such as density and purity, and eddy current measured resistivity of coatings. A two-probe differential system having higher sensitivity and less noise than a one-probe system with 2-D scanning ability was developed.

  19. Characterization and optimization of the magnetron directional amplifier

    NASA Astrophysics Data System (ADS)

    Hatfield, Michael Craig

    Many applications of microwave wireless power transmission (WPT) are dependent upon a high-powered electronically-steerable phased array composed of many radiating modules. The phase output from the high-gain amplifier in each module must be accurately controlled if the beam is to be properly steered. A highly reliable, rugged, and inexpensive design is essential for making WPT applications practical. A conventional microwave oven magnetron may be combined with a ferrite circulator and other external circuitry to create such a system. By converting it into a two-port amplifier, the magnetron is capable of delivering at least 30 dB of power gain while remaining phase-locked to the input signal over a wide frequency range. The use of the magnetron in this manner is referred to as a MDA (Magnetron Directional Amplifier). The MDA may be integrated with an inexpensive slotted waveguide array (SWA) antenna to form the Electronically-Steerable Phased Array Module (ESPAM). The ESPAM provides a building block approach to creating phased arrays for WPT. The size and shape of the phased array may be tailored to satisfy a diverse range of applications. This study provided an in depth examination into the capabilities of the MDA/ESPAM. The basic behavior of the MDA was already understood, as well as its potential applicability to WPT. The primary objective of this effort was to quantify how well the MDA could perform in this capacity. Subordinate tasks included characterizing the MDA behavior in terms of its system inputs, optimizing its performance, performing sensitivity analyses, and identifying operating limitations. A secondary portion of this study examined the suitability of the ESPAM in satisfying system requirements for the solar power satellite (SPS). Supporting tasks included an analysis of SPS requirements, modeling of the SWA antenna, and the demonstration of a simplified phased array constructed of ESPAM elements. The MDA/ESPAM is well suited for use as an

  20. Heteroepitaxial Ge-on-Si by DC magnetron sputtering

    SciTech Connect

    Steglich, Martin; Schrempel, Frank; Füchsel, Kevin; Kley, Ernst-Bernhard; Patzig, Christian; Berthold, Lutz; Höche, Thomas; Tünnermann, Andreas

    2013-07-15

    The growth of Ge on Si(100) by DC Magnetron Sputtering at various temperatures is studied by Spectroscopic Ellipsometry and Transmission Electron Microscopy. Smooth heteroepitaxial Ge films are prepared at relatively low temperatures of 380°C. Typical Stransky-Krastanov growth is observed at 410°C. At lower temperatures (320°C), films are essentially amorphous with isolated nanocrystallites at the Si-Ge interface. A minor oxygen contamination at the interface, developing after ex-situ oxide removal, is not seen to hinder epitaxy. Compensation of dislocation-induced acceptors in Ge by sputtering from n-doped targets is proposed.

  1. Lateral variation of target poisoning during reactive magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Güttler, D.; Grötzschel, R.; Möller, W.

    2007-06-01

    The reactive gas incorporation into a Ti sputter target has been investigated using laterally resolving ion beam analysis during dc magnetron deposition of TiN in an Ar /N2 atmosphere. At sufficiently low reactive gas flow, the nitrogen incorporation exhibits a pronounced lateral variation, with a lower areal density in the target racetrack compared to the target center and edge. The findings are reproduced by model calculations. In the racetrack, the balance of reactive gas injection and sputter erosion is shifted toward erosion. The injection of nitrogen is dominated by combined molecular adsorption and recoil implantation versus direct ion implantation.

  2. First demonstration and performance of an injection locked continuous wave magnetron to phase control a superconducting cavity

    SciTech Connect

    A.C. Dexter, G. Burt, R.G. Carter, I. Tahir, H. Wang, K. Davis, R. Rimmer

    2011-03-01

    The applications of magnetrons to high power proton and cw electron linacs are discussed. An experiment is described where a 2.45 GHz magnetron has been used to drive a single cell superconducting cavity. With the magnetron injection locked, a modest phase control accuracy of 0.95° rms has been demonstrated. Factors limiting performance have been identified.

  3. Modulated Electron Cyclotron Drift Instability in a High-Power Pulsed Magnetron Discharge

    NASA Astrophysics Data System (ADS)

    Tsikata, Sedina; Minea, Tiberiu

    2015-05-01

    The electron cyclotron drift instability, implicated in electron heating and anomalous transport, is detected in the plasma of a planar magnetron. Electron density fluctuations associated with the mode are identified via an adapted coherent Thomson scattering diagnostic, under direct current and high-power pulsed magnetron operation. Time-resolved analysis of the mode amplitude reveals that the instability, found at MHz frequencies and millimeter scales, also exhibits a kHz-scale modulation consistent with the observation of larger-scale plasma density nonuniformities, such as the rotating spoke. Sharply collimated axial fluctuations observed at the magnetron axis are consistent with the presence of escaping electrons in a region where the magnetic and electric fields are antiparallel. These results distinguish aspects of magnetron physics from other plasma sources of similar geometry, such as the Hall thruster, and broaden the scope of instabilities which may be considered to dictate magnetron plasma features.

  4. Modulated electron cyclotron drift instability in a high-power pulsed magnetron discharge.

    PubMed

    Tsikata, Sedina; Minea, Tiberiu

    2015-05-01

    The electron cyclotron drift instability, implicated in electron heating and anomalous transport, is detected in the plasma of a planar magnetron. Electron density fluctuations associated with the mode are identified via an adapted coherent Thomson scattering diagnostic, under direct current and high-power pulsed magnetron operation. Time-resolved analysis of the mode amplitude reveals that the instability, found at MHz frequencies and millimeter scales, also exhibits a kHz-scale modulation consistent with the observation of larger-scale plasma density nonuniformities, such as the rotating spoke. Sharply collimated axial fluctuations observed at the magnetron axis are consistent with the presence of escaping electrons in a region where the magnetic and electric fields are antiparallel. These results distinguish aspects of magnetron physics from other plasma sources of similar geometry, such as the Hall thruster, and broaden the scope of instabilities which may be considered to dictate magnetron plasma features. PMID:26001007

  5. Closed field unbalanced magnetron sputtering ion plating of Ni/Al thin films: influence of the magnetron power.

    PubMed

    Said, R; Ahmed, W; Gracio, J

    2010-04-01

    In this study NiAl thin films have been deposited using closed field unbalanced magnetron sputtering Ion plating (CFUBMSIP). The influence of magnetron power has been investigated using dense and humongous NiAl compound targets onto stainless steel and glass substrates. Potential applications include tribological, electronic media and bond coatings in thermal barrier coatings system. Several techniques has been used to characterise the films including surface stylus profilometry, energy dispersive spectroscopy (EDAX), X-Ray diffraction (XRD) Composition analysis of the samples was carried out using VGTOF SIMS (IX23LS) and Atomic force microscopy (AFM). Scratch tester (CSM) combined with acoustic emission singles during loading in order to compare the coating adhesion. The acoustic emission signals emitted during the indentation process were used to determine the critical load, under which the film begins to crack and/or break off the substrate. The average thickness of the films was approximately 1 um. EDAX results of NiAl thin films coating with various magnetron power exhibited the near equal atomic% Ni:Al. The best result being obtained using 300 W and 400 W DC power for Ni and Al targets respectively. XRD revealed the presence of beta NiAl phase for all the films coatings. AFM analysis of the films deposited on glass substrates exhibited quite a smooth surface with surface roughness values in the nanometre range. CSM results indicate that best adhesion was achieved at 300 W for Ni, and 400 W for Al targets compared to sample other power values. SIMS depth profile showed a uniform distribution of the Ni and Al component from the surface of the film to the interface. PMID:20355462

  6. Magnetron Driven L Band RF Gun using a Photocathode Emitter

    NASA Astrophysics Data System (ADS)

    Evans, Kirk; Fisher, Amnon; Friedman, Moshe

    1996-11-01

    Magnetron Driven L Band RF Gun using a Photocathode Emitter A tunable 5 megawatt L-Band injection locked magnetron amplifier is used to drive a 1-1/2 cell RF cavity gun, to produce a 2.5 megavolt electron beam. A tunable RF source relaxes the precision of the cavity gun construction, and therefore simplifies the design and reduces the overall cost. The design of the L-Band ( 1.3 GHz) RF cavity linear accelerator is presented, along with Superfish, SOS computer simulations, and calculations of beam energy and temporal qualities. Measurements of a few robust photocathode materials as well as measurements of the beam qualities of the final accelerator are presented. Future work will utilize new semiconductor laser diodes that can be electrically driven in the gigahertz range. This makes possible an electron gun system which can run at the RF frequency used to accelerate the electron beam. Such a system produces a "lock to clock" and synchronized RF and electron beam source which can be run single shot or any rep rate up to the RF frequency.

  7. Plasma potential mapping of high power impulse magnetron sputtering discharges

    SciTech Connect

    Rauch, Albert; Mendelsberg, Rueben J.; Sanders, Jason M.; Anders, Andre

    2012-04-15

    Pulsed emissive probe techniques have been used to determine the plasma potential distribution of high power impulse magnetron sputtering (HiPIMS) discharges. An unbalanced magnetron with a niobium target in argon was investigated for a pulse length of 100 {mu}s at a pulse repetition rate of 100 Hz, giving a peak current of 170 A. The probe data were recorded with a time resolution of 20 ns and a spatial resolution of 1 mm. It is shown that the local plasma potential varies greatly in space and time. The lowest potential was found over the target's racetrack, gradually reaching anode potential (ground) several centimeters away from the target. The magnetic presheath exhibits a funnel-shaped plasma potential resulting in an electric field which accelerates ions toward the racetrack. In certain regions and times, the potential exhibits weak local maxima which allow for ion acceleration to the substrate. Knowledge of the local E and static B fields lets us derive the electrons'ExB drift velocity, which is about 10{sup 5} m/s and shows structures in space and time.

  8. Asymmetric particle fluxes from drifting ionization zones in sputtering magnetrons

    NASA Astrophysics Data System (ADS)

    Panjan, Matjaž; Franz, Robert; Anders, André

    2014-04-01

    Electron and ion fluxes from direct current and high-power impulse magnetron sputtering (dcMS and HiPIMS) plasmas were measured in the plane of the target surface. Biased collector probes and a particle energy and mass analyzer showed asymmetric emission of electrons and of singly and doubly charged ions. For both HiPIMS and dcMS discharges, higher fluxes of all types of particles were observed in the direction of the electrons' E × B drift. These results are put in the context with ionization zones that drift over the magnetron's racetrack. The measured currents of time-resolving collector probes suggest that a large fraction of the ion flux originates from drifting ionization zones, while energy-resolving mass spectrometry indicates that a large fraction of the ion energy is due to acceleration by an electric field. This supports the recently proposed hypothesis that each ionization zone is associated with a negative-positive-negative space charge structure, thereby producing an electric field that accelerates ions from the location where they were formed.

  9. Electrical characterization of an rf planar magnetron in inert gases

    NASA Astrophysics Data System (ADS)

    Minea, T. M.; Bretagne, J.; Pagnon, D.; Touzeau, M.

    2000-08-01

    Electrical aspects of an rf planar magnetron discharge in noble gases at pressures below 50 mTorr are discussed. The electrical parameters of the experimental device are measured by a diagnostic system consisting of two probes, a capacitive voltage divider and a current loop. The measurements of the rf current and voltage and the fast Fourier transform treatment of recorded signals are used to verify the validity of the `subtraction' method in order to estimate the power deposited into the plasma. This technique shows a better power coupling with a metallic target, up to 90% of the rf delivered power, than for an insulating target for which the power efficiency hardly reaches 50%. In addition, the elementary mechanisms sustaining the rf planar magnetron discharge are analysed. A transition from a combination of α (`wave-riding') and γ (secondary electron emission) regimes above a critical pressure to an α dominant regime at very low pressure is pointed out. This phenomenon is explained by the results of a particle-in-cell Monte Carlo collision simulation.

  10. On Tomonaga's theory of split-anode magnetrons

    NASA Astrophysics Data System (ADS)

    Dittrich, Walter

    2016-06-01

    This article offers a review of the history of radar research and its application in the 20th century. After describing the wartime work of Sin-Itiro Tomonaga and his theory of the cavity magnetron, we formulate the equations of motion of an electron in a cavity magnetron using action-angle variables. This means following the electron's path on its way from a cylindrical cathode moving toward a co-axial cylindrical anode in presence of a uniform magnetic field parallel to the common axis. After analyzing the situation without coupling to an external oscillatory electric field, we employ methods of canonical perturbation theory to find the resonance condition between the frequencies of the free theory ωr, ωϕ and the applied perturbing oscillatory frequency ω. A long-time averaging process will then eliminate the periodic terms in the equation for the now time-dependent action-angle variables. The terms that are no longer periodic will cause secular changes so that the canonical action-angle variables (J, δ) change in a way that the path of the electron will deform gradually so that it can reach the anode. How the ensemble of the initially randomly distributed electrons forms spokes and how their energy is conveyed to the cavity-field oscillation is the main focus of this article. Some remarks concerning the importance of results in QED and the invention of radar theory and application conclude the article.

  11. Double circular erosion patterns on dielectric target in magnetron sputtering.

    PubMed

    Suzaki, Yoshifumi; Miyagawa, Hayato; Ejima, Seiki

    2009-10-01

    In rf magnetron sputtering, a circular erosion pattern forms on the surface of a circular metal conductor target with permanent magnets on its back. In this case, the theory behind the erosion pattern has been established. However, in the case of a dielectric target, a double circular erosion pattern is formed. So far, this pattern has been phenomenologically recognized by experimenters; however, it has not yet been investigated. In this study, we performed a magnetron sputtering experiment with a SiO2 dielectric target, and confirmed the formation of a double circular erosion pattern. The dimensions of the double circular erosion pattern varied depending on the insulation resistance or the thickness of the SiO2 target. Furthermore, we found that the dimensions of a double circular erosion pattern changed by making a gap between the SiO2 target and guard ring. Based on the experimental results, we have proposed a qualitative model to explain the formation mechanism of double circular erosion patterns. PMID:19895082

  12. On Tomonaga's theory of split-anode magnetrons

    NASA Astrophysics Data System (ADS)

    Dittrich, Walter

    2016-05-01

    This article offers a review of the history of radar research and its application in the 20th century. After describing the wartime work of Sin-Itiro Tomonaga and his theory of the cavity magnetron, we formulate the equations of motion of an electron in a cavity magnetron using action-angle variables. This means following the electron's path on its way from a cylindrical cathode moving toward a co-axial cylindrical anode in presence of a uniform magnetic field parallel to the common axis. After analyzing the situation without coupling to an external oscillatory electric field, we employ methods of canonical perturbation theory to find the resonance condition between the frequencies of the free theory ω r ,ω ϕ and the applied perturbing oscillatory frequency ω. A long-time averaging process will then eliminate the periodic terms in the equation for the now time-dependent action-angle variables. The terms that are no longer periodic will cause secular changes so that the canonical action-angle variables (J,δ) change in a way that the path of the electron will deform gradually so that it can reach the anode. How the ensemble of the initially randomly distributed electrons forms spokes and how their energy is conveyed to the cavity-field oscillation is the main focus of this article. Some remarks concerning the importance of results in QED and the invention of radar theory and application conclude the article.

  13. Unbalance magnetron plasma source for ion mass-separator

    NASA Astrophysics Data System (ADS)

    Paperny, V. L.; Krasov, V. I.; Astrakchantsev, N. V.; Lebedev, N. V.

    2014-11-01

    The report presents the results of the preliminary studies characteristics of an unbalanced magnetron plasma source supplied with the transport system based on a curved magnetic field. The aim of these studies was to recognize if the system is suitable, in principle, for mass-separation of a multi-component plasma flow. The magnetron source has 50 mm diameter cathode manufactured of an alloy composed of Cu (64%), Pb (22.5%) and admixtures, about of 14% (Al, Zn, C). By means of an immersion time-of-flight spectrometer, a spatial distribution of ions of the cathode material was measured through the system output cross-section. Distribution of atom of these elements was measured here by the X-ray fluorescence spectrometry as well. Both methods showed that the ions of the lighter element (Cu) were concentrated in the inner part of the plasma flow deflected by the magnetic field while the distribution of the heavy element (Pb) was shifted toward the outer area of the flow. The similar effect was observed for each couple of the elements. Such a system is promising for use in plasma technology of reprocessing spent nuclear fuel, namely for separation heavy radioactive fission product from nuclear waste.

  14. Elementary surface processes during reactive magnetron sputtering of chromium

    SciTech Connect

    Monje, Sascha; Corbella, Carles Keudell, Achim von

    2015-10-07

    The elementary surface processes occurring on chromium targets exposed to reactive plasmas have been mimicked in beam experiments by using quantified fluxes of Ar ions (400–800 eV) and oxygen atoms and molecules. For this, quartz crystal microbalances were previously coated with Cr thin films by means of high-power pulsed magnetron sputtering. The measured growth and etching rates were fitted by flux balance equations, which provided sputter yields of around 0.05 for the compound phase and a sticking coefficient of O{sub 2} of 0.38 on the bare Cr surface. Further fitted parameters were the oxygen implantation efficiency and the density of oxidation sites at the surface. The increase in site density with a factor 4 at early phases of reactive sputtering is identified as a relevant mechanism of Cr oxidation. This ion-enhanced oxygen uptake can be attributed to Cr surface roughening and knock-on implantation of oxygen atoms deeper into the target. This work, besides providing fundamental data to control oxidation state of Cr targets, shows that the extended Berg's model constitutes a robust set of rate equations suitable to describe reactive magnetron sputtering of metals.

  15. EMI shielding using composite materials with two sources magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Ziaja, J.; Jaroszewski, M.; Lewandowski, M.

    2016-02-01

    In this study, the preparation composite materials for electromagnetic shields using two sources magnetron sputtering DC-M is presented. A composite material was prepared by coating a nonwoven polypropylene metallic layer in sputtering process of targets Ti (purity 99%) and brass alloy MO58 (58%Cu, 40%Zn, 2%Pb) and ϕ diameter targets = 50 mm, under argon atmosphere. The system with magnetron sputtering sources was powered using switch-mode power supply DPS (Dora Power System) with a maximum power of 16 kW and a maximum voltage of 1.2 kV with group frequency from 50 Hz to 5 kHz. The influence of sputtering time of individual targets on the value of the EM field attenuation SE [dB] was investigated for the following supply conditions: pressure pp = 2x10-3 Torr, sputtering power P = 750 W, the time of applying a layer t = 5 min, group frequency fg = 2 kHz, the frequency of switching between targets fp = 1 Hz.

  16. Plasma potential mapping of high power impulse magnetron sputtering discharges

    SciTech Connect

    Rauch, Albert; Mendelsberg, Rueben J.; Sanders, Jason M.; Anders, Andre

    2011-12-20

    Pulsed emissive probe techniques have been used to determine the plasma potential distribution of high power impulse magnetron sputtering (HiPIMS) discharges. An unbalanced magnetron with a niobium target in argon was investigated for pulse length of 100 μs at a pulse repetition rate of 100 Hz, giving a peak current of 170 A. The probe data were taken with a time resolution of 20 ns and a spatial resolution of 1 mm. It is shown that the local plasma potential varies greatly in space and time. The lowest potential was found over the target’s racetrack, gradually reaching anode potential (ground) several centimeters away from the target. The magnetic pre-sheath exhibits a funnel-shaped plasma potential resulting in an electric field which accelerates ions toward the racetrack. In certain regions and times, the potential exhibits weak local maxima which allow for ion acceleration to the substrate. Knowledge of the local E and static B fields lets us derive the electrons’ E×B drift velocity, which is about 105 m/s and shows structures in space and time.

  17. An inverted cylindrical sputter magnetron as metal vapor supply for electron cyclotron resonance ion sources.

    PubMed

    Weichsel, T; Hartung, U; Kopte, T; Zschornack, G; Kreller, M; Silze, A

    2014-05-01

    An inverted cylindrical sputter magnetron device has been developed. The magnetron is acting as a metal vapor supply for an electron cyclotron resonance (ECR) ion source. FEM simulation of magnetic flux density was used to ensure that there is no critical interaction between both magnetic fields of magnetron and ECR ion source. Spatially resolved double Langmuir probe and optical emission spectroscopy measurements show an increase in electron density by one order of magnitude from 1 × 10(10) cm(-3) to 1 × 10(11) cm(-3), when the magnetron plasma is exposed to the magnetic mirror field of the ECR ion source. Electron density enhancement is also indicated by magnetron plasma emission photography with a CCD camera. Furthermore, photographs visualize the formation of a localized loss-cone - area, when the magnetron is operated at magnetic mirror field conditions. The inverted cylindrical magnetron supplies a metal atom load rate of R > 1 × 10(18) atoms/s for aluminum, which meets the demand for the production of a milliampere Al(+) ion beam. PMID:24880358

  18. An inverted cylindrical sputter magnetron as metal vapor supply for electron cyclotron resonance ion sources

    SciTech Connect

    Weichsel, T. Hartung, U.; Kopte, T.; Zschornack, G.; Kreller, M.; Silze, A.

    2014-05-15

    An inverted cylindrical sputter magnetron device has been developed. The magnetron is acting as a metal vapor supply for an electron cyclotron resonance (ECR) ion source. FEM simulation of magnetic flux density was used to ensure that there is no critical interaction between both magnetic fields of magnetron and ECR ion source. Spatially resolved double Langmuir probe and optical emission spectroscopy measurements show an increase in electron density by one order of magnitude from 1 × 10{sup 10} cm{sup −3} to 1 × 10{sup 11} cm{sup −3}, when the magnetron plasma is exposed to the magnetic mirror field of the ECR ion source. Electron density enhancement is also indicated by magnetron plasma emission photography with a CCD camera. Furthermore, photographs visualize the formation of a localized loss-cone - area, when the magnetron is operated at magnetic mirror field conditions. The inverted cylindrical magnetron supplies a metal atom load rate of R > 1 × 10{sup 18} atoms/s for aluminum, which meets the demand for the production of a milliampere Al{sup +} ion beam.

  19. Derivation and generalization of the dispersion relation of rising-sun magnetron with sectorial and rectangular cavities

    SciTech Connect

    Shi, Di-Fu; Qian, Bao-Liang; Wang, Hong-Gang; Li, Wei

    2013-12-15

    Field analysis method is used to derive the dispersion relation of rising-sun magnetron with sectorial and rectangular cavities. This dispersion relation is then extended to the general case in which the rising-sun magnetron can be with multi-group cavities of different shapes and sizes, and from which the dispersion relations of conventional magnetron, rising-sun magnetron, and magnetron-like device can be obtained directly. The results show that the relative errors between the theoretical and simulation values of the dispersion relation are less than 3%, the relative errors between the theoretical and simulation values of the cutoff frequencies of π mode are less than 2%. In addition, the influences of each structure parameter of the magnetron on the cutoff frequency of π mode and on the mode separation are investigated qualitatively and quantitatively, which may be of great interest to designing a frequency tuning magnetron.

  20. Advanced process control and novel test methods for PVD silicon and elastomeric silicone coatings utilized on ion implant disks, heatsinks and selected platens

    SciTech Connect

    Springer, J.; Allen, B.; Wriggins, W.; Kuzbyt, R.; Sinclair, R.

    2012-11-06

    Coatings play multiple key roles in the proper functioning of mature and current ion implanters. Batch and serial implanters require strategic control of elemental and particulate contamination which often includes scrutiny of the silicon surface coatings encountering direct beam contact. Elastomeric Silicone Coatings must accommodate wafer loading and unloading as well as direct backside contact during implant plus must maintain rigid elemental and particulate specifications. The semiconductor industry has had a significant and continuous effort to obtain ultra-pure silicon coatings with sustained process performance and long life. Low particles and reduced elemental levels for silicon coatings are a major requirement for process engineers, OEM manufacturers, and second source suppliers. Relevant data will be presented. Some emphasis and detail will be placed on the structure and characteristics of a relatively new PVD Silicon Coating process that is very dense and homogeneous. Wear rate under typical ion beam test conditions will be discussed. The PVD Silicon Coating that will be presented here is used on disk shields, wafer handling fingers/fences, exclusion zones of heat sinks, beam dumps and other beamline components. Older, legacy implanters can now provide extended process capability using this new generation PVD silicon - even on implanter systems that were shipped long before the advent of silicon coating for contamination control. Low particles and reduced elemental levels are critical performance criteria for the silicone elastomers used on disk heatsinks and serial implanter platens. Novel evaluation techniques and custom engineered tools are used to investigate the surface interaction characteristics of multiple Elastomeric Silicone Coatings currently in use by the industry - specifically, friction and perpendicular stiction. These parameters are presented as methods to investigate the critical wafer load and unload function. Unique tools and test

  1. Advanced process control and novel test methods for PVD silicon and elastomeric silicone coatings utilized on ion implant disks, heatsinks and selected platens

    NASA Astrophysics Data System (ADS)

    Springer, J.; Allen, B.; Wriggins, W.; Kuzbyt, R.; Sinclair, R.

    2012-11-01

    Coatings play multiple key roles in the proper functioning of mature and current ion implanters. Batch and serial implanters require strategic control of elemental and particulate contamination which often includes scrutiny of the silicon surface coatings encountering direct beam contact. Elastomeric Silicone Coatings must accommodate wafer loading and unloading as well as direct backside contact during implant plus must maintain rigid elemental and particulate specifications. The semiconductor industry has had a significant and continuous effort to obtain ultra-pure silicon coatings with sustained process performance and long life. Low particles and reduced elemental levels for silicon coatings are a major requirement for process engineers, OEM manufacturers, and second source suppliers. Relevant data will be presented. Some emphasis and detail will be placed on the structure and characteristics of a relatively new PVD Silicon Coating process that is very dense and homogeneous. Wear rate under typical ion beam test conditions will be discussed. The PVD Silicon Coating that will be presented here is used on disk shields, wafer handling fingers/fences, exclusion zones of heat sinks, beam dumps and other beamline components. Older, legacy implanters can now provide extended process capability using this new generation PVD silicon - even on implanter systems that were shipped long before the advent of silicon coating for contamination control. Low particles and reduced elemental levels are critical performance criteria for the silicone elastomers used on disk heatsinks and serial implanter platens. Novel evaluation techniques and custom engineered tools are used to investigate the surface interaction characteristics of multiple Elastomeric Silicone Coatings currently in use by the industry - specifically, friction and perpendicular stiction. These parameters are presented as methods to investigate the critical wafer load and unload function. Unique tools and test

  2. Simulation Study Using an Injection Phase-locked Magnetron as an Alternative Source for SRF Accelerators

    SciTech Connect

    Wang, Haipeng; Plawski, Tomasz E.; Rimmer, Robert A.

    2015-09-01

    As a drop-in replacement for the CEBAF CW klystron system, a 1497 MHz, CW-type high-efficiency magnetron using injection phase lock and amplitude variation is attractive. Amplitude control using magnetic field trimming and anode voltage modulation has been studied using analytical models and MATLAB/Simulink simulations. Since the 1497 MHz magnetron has not been built yet, previously measured characteristics of a 2.45GHz cooker magnetron are used as reference. The results of linear responses to the amplitude and phase control of a superconducting RF (SRF) cavity, and the expected overall benefit for the current CEBAF and future MEIC RF systems are presented in this paper.

  3. Flexible free-standing TiO2/graphene/PVdF films as anode materials for lithium-ion batteries

    NASA Astrophysics Data System (ADS)

    Ren, H. M.; Ding, Y. H.; Chang, F. H.; He, X.; Feng, J. Q.; Wang, C. F.; Jiang, Y.; Zhang, P.

    2012-12-01

    Graphene composites were prepared by hydrothermal method using titanium dioxide (TiO2) adsorbed graphene oxide (GO) sheets as precursors. Free-standing hybrid films for lithium-ion batteries were prepared by adding TiO2/graphene composites to the polyvinylidene fluoride (PVdF)/N-methyl-2-pyrrolidone (NMP) solution, followed by a solvent evaporation technique. These films were characterized by atomic force microscopy (AFM), X-ray diffraction (XRD), scanning electron microscopy (SEM) and various electrochemical techniques. Flexible films show an excellent cycling performance, which was attributed to the interconnected graphene conducting network, which depressed the increasing of electric resistance during the cycling.

  4. Microstructure of microwave dielectricthin films by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Shi, Feng; Cui, Chuanwen

    2010-02-01

    The article describes the microstructure and morphological properties of microwave dielectric ceramic thin films. These thin films were successfully prepared on SiO 2 (1 1 0) single-crystal substrates by radio frequency magnetron-sputtering system. The microstructure and morphology of the thin films were characterized by X-ray diffraction, scanning electron microscopy, atomic force microscopy, and transmission electron microscopy. The results show that the main phase is Ba 0.5Sr 0.5Nb 2O 6,which has a tetragonal perovskite structure, a long strip pattern, and uniform crystal-grain size of about 2-3 μm in length when annealed under 1150 °C for 30 min in an O 2 atmosphere. These thin films are of excellent crystallization quality, with a polycrystalline and dense structure.

  5. Magnetron with flux switching cathode and method of operation

    DOEpatents

    Aaron, D.B.; Wiley, J.D.

    1989-09-12

    A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness. 5 figs.

  6. Magnetron with flux switching cathode and method of operation

    DOEpatents

    Aaron, David B.; Wiley, John D.

    1989-01-01

    A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness.

  7. Full-Scale 3D Simulation of a sputtering magnetron

    NASA Astrophysics Data System (ADS)

    Walton, C. C.; Wilks, S. C.; Ayyaswamy, V.; Verboncoeur, J. P.; Parks, P. B.; Wu, W.; Zhou, C. D.; Stoltz, P. H.

    2010-11-01

    PIC simulations have been used to study ion energy distributions in magnetron plasmas, and coupled with other simulations to relate plasma processes to properties of sputtered films. The plasma is weakly ionized and exchanges heat with the background gas by scattering and charge-exchange reactions. Resulting heating of neutral background gas up to ˜1200K, leading to ˜5X rarefaction and increased plasma impedance, was studied with coupled PIC and Direct Simulation Monte Carlo (DSMC) simulations. Effects of scaling the PIC simulations from 0.1X to 1X physical size, and modifying the plasma potential by a dc substrate bias, will be presented. Comparison to experimental I-V relations and importance for roughness and density of sputtered films will be discussed.

  8. Analysis of Low Frequency Oscillations in Magnetron Injection Guns

    NASA Astrophysics Data System (ADS)

    Pu, Youlei; Luo, Yong; Yan, Ran; Liu, Guo; Jiang, Wei

    2012-02-01

    In our gyro-TWT experiments, low-frequency oscillations (LFOs) had been observed. LFOs is a physical phenomenon usually caused by the electrons trapped between the magnetron injection guns (MIGs) and the interaction region. In this paper, the formation procedure and physical mechanism of LFOs are reported. Available methods including optimizing the magnetic field distribution in the beam compression region and loading bevel cuts on the second anode are involved to capture the trapped electrons, suppress the LFOs and improve the helical electron beam quality. Simulations and experimental results are in good agreement with each other and also reveal the reasonableness of this means. Finally, the influence of current capture ratio on LFOs and the beam quality are studied. With the current capture ratio increasing, the amplitude of LFOs decreases, the pitch factor maintains a constant about 1.2 and we also demonstrate a low transverse velocity spread about 3%.

  9. RF magnetron sputtering of thick platinum coatings on glass microspheres

    SciTech Connect

    Meyer, S.F.; Hsieh, E.J.; Burt, R.J.

    1980-05-28

    Thick platinum coatings on glass microspheres are needed for proposed Laser Fusion targets. The spherical nature of these substrates coupled with the small dimensions (approx. 100 ..mu..m OD) make it difficult to achieve a smooth and uniform coating. Coating problems encountered include a rough surface and porous microstructure from the oblique incidence and lack of temperature and bias control, clumping of the microspheres causing non-uniformities, and particle accumulation causing cone defects. Sputtering parameters significantly affecting the coatings include total pressure, DC substrate bias, and the addition of doping gases. Using an ultrasonic vibrating screened cage and RF magnetron Sputtergun, we have successfully batch coated microspheres with up to 6 ..mu..m of Pt, with a surface roughness of 200 nm, thickness non-concentricity of 300 nm, and density greater than 98% of bulk Pt.

  10. Experimental evidence of warm electron populations in magnetron sputtering plasmas

    SciTech Connect

    Sahu, B. B. Han, Jeon G.; Kim, Hye R.; Ishikawa, K.; Hori, M.

    2015-01-21

    This work report on the results obtained using the Langmuir probe (LP) measurements in high-power dc magnetron sputtering discharges. Data show clear evidence of two electron components, such as warm and bulk electrons, in the sputtering plasma in a magnetic trap. We have also used optical emission spectroscopy diagnostic method along with LP to investigate the plasma production. Data show that there is a presence of low-frequency oscillations in the 2–3 MHz range, which are expected to be generated by high-frequency waves. Analysis also suggests that the warm electrons, in the plasmas, can be formed due to the collisionless Landau damping of the bulk electrons.

  11. Highly conducting ZnSe films by reactive magnetron sputtering

    NASA Technical Reports Server (NTRS)

    Nouhi, A.; Stirn, R. J.

    1986-01-01

    This paper presents the results of an effort to deposit high-conductivity ZnSe on glass and conducting SnO2-coated glass substrates by reactive magnetron sputter deposition, using pure metal sputter targets of Zn and dopants such as In, Ga, and Al. Clear yellow ZnSe films were successfully obtained. By using substrate temperatures as low as 150 C, cosputtered dopants, and sputter parameters and H2Se injection rates which maximize the Zn-to-Se ratio in the films, ZnSe bulk resistivities have been lowered by up to seven orders of magnitude, reaching values as low as 20 ohm cm. The most effective dopant to data has been In, cosputtered with Zn in amounts leading to In atomic concentrations as high as 1.4 percent. Atomic-absorption measurements show an average 49.9/48.9 ratio of Zn to Se.

  12. Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

    SciTech Connect

    Martines, E.; Zuin, M.; Cavazzana, R.; Antoni, V.; Serianni, G.; Spolaore, M.; Vianello, N.; Adámek, J.

    2014-10-15

    A feedforward scheme is applied for drift waves control in a magnetized magnetron sputtering plasma. A system of driven electrodes collecting electron current in a limited region of the explored plasma is used to interact with unstable drift waves. Drift waves actually appear as electrostatic modes characterized by discrete wavelengths of the order of few centimeters and frequencies of about 100 kHz. The effect of external quasi-periodic, both in time and space, travelling perturbations is studied. Particular emphasis is given to the role played by the phase relation between the natural and the imposed fluctuations. It is observed that it is possible by means of localized electrodes, collecting currents which are negligible with respect to those flowing in the plasma, to transfer energy to one single mode and to reduce that associated to the others. Due to the weakness of the external action, only partial control has been achieved.

  13. Modeling of Magnetron Argon Plasma Issuing into Ambient Air

    NASA Astrophysics Data System (ADS)

    Li, Lin-Cun; Xia, Wei-Dong

    2008-01-01

    A mathematical model is presented to describe the heat transfer and fluid flow in a magnetron plasma torch, by means of a commercial computational fluid dynamics (CFD) code fluent. Specific calculations are presented for a gas-mixing system (i.e., an argon plasma discharging into an air environment), operating in a laminar mode. Numerical results show that an external axial magnetic field (AMF) may have a significant effect on the behavior of an arc plasma, i.e., the AMF will impel the plasma to retract axially and expand radially. In addition, the use of an AMF induces a strong air indraft at the torch spout, and the air mixing with the argon gas results in a marked increase in arc voltage. An increment in the amount of the oncoming argon gas restrains the quantity of the air indraft, and this should be responsible for a lower arc voltage in such an AMF torch when a larger gas inflow is used.

  14. Magnetron deposition of TCO films using ion beam

    NASA Astrophysics Data System (ADS)

    Asainov, O.; Umnov, S.; Chinin, A.

    2015-11-01

    Thin films of tin oxide (TO) were deposited on the glass substrates at room temperature using reactive magnetron sputtering at various oxygen partial pressures. After the deposition the films were irradiated with argon ions beam. The change of the optical and electrical properties of the films depending on the irradiation time was studied. Films optical properties in the range of 300-1100 nm were investigated by photometry as well as their structural properties were studied using X-ray diffraction. Diffractometric research showed that the films, deposited on a substrate, have a crystal structure, and after argon ions irradiation they become quasi-crystalline (amorphous). It was found that the transmission increases proportionally with the irradiation time, but the surface resistance -disproportionally.

  15. GaAs Films Prepared by RF-Magnetron Sputtering

    SciTech Connect

    L.H. Ouyang; D.L. Rode; T. Zulkifli; B. Abraham-Shrauner; N. Lewis; M.R. Freeman

    2001-08-01

    The authors reported on the optical absorption, adhesion, and microstructure of RF-magnetron sputtered films of hydrogenated amorphous and microcrystalline GaAs films for the 1 to 25 {micro}m infrared wavelength rate. Sputtering parameters which were varied include sputtering power, temperature and pressure, and hydrogen sputtering-gas concentration. TEM results show a sharp transition from purely amorphous GaAs to a mixture of microcrystalline GaAs in an amorphous matrix at 34 {+-} 2 C. By optimizing the sputtering parameters, the optical absorption coefficient can be decreased below 100 cm{sup -1} for wavelengths greater than about 1.25 {micro}m. These results represent the lowest reported values of optical absorption for sputtered films of GaAs directly measured by spectrophotometry for the near-infrared wavelength region.

  16. Characterization on RF magnetron sputtered niobium pentoxide thin films

    SciTech Connect

    Usha, N.; Sivakumar, R.; Sanjeeviraja, C.

    2014-10-15

    Niobium pentoxide (Nb{sub 2}O{sub 5}) thin films with amorphous nature were deposited on microscopic glass substrates at 100°C by rf magnetron sputtering technique. The effect of rf power on the structural, morphological, optical, and vibrational properties of Nb{sub 2}O{sub 5} films have been investigated. Optical study shows the maximum average transmittance of about 87% and the optical energy band gap (indirect allowed) changes between 3.70 eV and 3.47 eV. AFM result indicates the smooth surface nature of the samples. Photoluminescence measurement showed the better optical quality of the deposited films. Raman spectra show the LO-TO splitting of Nb-O stretching of Nb{sub 2}O{sub 5} films.

  17. Ion-induced oxidation of aluminum during reactive magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Kreiter, Oliver; Grosse-Kreul, Simon; Corbella, Carles; von Keudell, Achim

    2013-04-01

    Particle beam experiments were conducted in an ultra-high-vacuum vessel to mimic target poisoning during reactive magnetron sputtering of aluminum. Aluminum targets were exposed to quantified beams of argon ions, oxygen atoms and molecules, and aluminum vapour. The growth and etch rates were measured in situ by means of an Al-coated quartz crystal microbalance. The chemical state of the target surface was monitored in-situ by real-time Fourier transform infrared spectroscopy. The surface processes were modelled through a set of balance equations providing sputter yields and sticking coefficients. The results indicate that the oxygen uptake of the aluminum surface is enhanced by a factor 1 to 2 by knock-on implantation and that the deposition of aluminum is not affected by the oxidation state of the surface.

  18. Influence of RF power on magnetron sputtered AZO films

    SciTech Connect

    Agarwal, Mohit; Modi, Pankaj; Dusane, R. O.

    2013-02-05

    Al-doped Zinc Oxide (AZO) transparent conducting films are prepared on glass substrate by RF magnetron sputtering under different RF power with a 3 inch diameter target of 2 wt%Al{sub 2}O{sub 3} in zinc oxide. The effect of RF power on the structural, optical and electrical properties of AZO films was investigated by X-ray Diffraction (XRD), Hall measurement and UV-Visible spectrophotometry. The XRD data indicates a preferential c-axis orientation for all the films. All films exhibit high transmittance (<90%) in visible region. Films deposited at 60 W power exhibit lowest resistivity of 5.7 Multiplication-Sign 10{sup -4}{omega}cm. Such low-resistivity and high-transmittance AZO films when prepared using low RF power at room temperature could find important applications in flexible electronics.

  19. Dual-Income Families.

    ERIC Educational Resources Information Center

    McKitric, Eloise J.

    The impact of economic conditions on two-earner families was examined. Three family types were studied: (1) dual-career family--both the husband and wife are in the labor force but in occupations classified as professional-technical or managerial; (2) dual-earner--both the husband and wife are in the labor force; and (3) traditional family--the…

  20. The Dual Career Family.

    ERIC Educational Resources Information Center

    Gurtin, Lee

    1980-01-01

    The dual career couple is forced to make a series of choices and compromises that impact the realms of marriage and career. The dilemmas that confront dual career marriages can be overcome only by compromise, accommodation, and mutual understanding on the part of the individuals involved. A revamping of human resources and recruitment programs is…

  1. Dual drive actuators

    NASA Technical Reports Server (NTRS)

    Packard, D. T.

    1982-01-01

    A new class of electromechanical actuators is described. These dual drive actuators were developed for the NASA-JPL Galileo Spacecraft. The dual drive actuators are fully redundant and therefore have high inherent reliability. They can be used for a variety of tasks, and they can be fabricated quickly and economically.

  2. Dual Enrollment Academy Programs

    ERIC Educational Resources Information Center

    Gonzalez, Nicolas; Chavez, Guadalupe

    2009-01-01

    Dual Enrollment Engineering (DEEA) and Medical Science (DEMSA) Academies are two-year dual enrollment programs for high school students. Students explore engineering and medical careers through college coursework. Students prepare for higher education in engineering and medical fields while completing associate degrees in biology or engineering…

  3. Magnetron-Sputtered YSZ and CGO Electrolytes for SOFC

    NASA Astrophysics Data System (ADS)

    Solovyev, A. A.; Shipilova, A. V.; Ionov, I. V.; Kovalchuk, A. N.; Rabotkin, S. V.; Oskirko, V. O.

    2016-03-01

    Reactive magnetron sputtering has been used for deposition of yttria-stabilized ZrO2 (YSZ) and gadolinium-doped CeO2 (CGO) layers on NiO-YSZ commercial anodes for solid oxide fuel cells. To increase the deposition rate and improve the quality of the sputtered thin oxide films, asymmetric bipolar pulse magnetron sputtering was applied. Three types of anode-supported cells, with single-layer YSZ or CGO and YSZ/CGO bilayer electrolyte, were prepared and investigated. Optimal thickness of oxide layers was determined experimentally. Based on the electrochemical characteristics of the cells, it is shown that, at lower operating temperatures of 650°C to 700°C, the cells with single-layer CGO electrolyte are most effective. The power density of these fuel cells exceeds that of the cell based on YSZ single-layer electrolyte at the same temperature. Power densities of 650 mW cm-2 and 500 mW cm-2 at 700°C were demonstrated by cells with single-layer YSZ and CGO electrolyte, respectively. Significantly enhanced maximum power density was achieved in a bilayer-electrolyte single cell, as compared with cells with a single electrolyte layer. Maximum power density of 1.25 W cm-2 at 800°C and 1 W cm-2 at 750°C under voltage of 0.7 V were achieved for the YSZ/CGO bilayer electrolyte cell with YSZ and CGO thickness of about 4 μm and 1.5 μm, respectively. This signifies that the YSZ thin film serves as a blocking layer to prevent electrical current leakage in the CGO layer, leading to the overall enhanced performance. This performance is comparable to the state of the art for cells based on YSZ/CGO bilayer electrolyte.

  4. Magnetron-Sputtered YSZ and CGO Electrolytes for SOFC

    NASA Astrophysics Data System (ADS)

    Solovyev, A. A.; Shipilova, A. V.; Ionov, I. V.; Kovalchuk, A. N.; Rabotkin, S. V.; Oskirko, V. O.

    2016-08-01

    Reactive magnetron sputtering has been used for deposition of yttria-stabilized ZrO2 (YSZ) and gadolinium-doped CeO2 (CGO) layers on NiO-YSZ commercial anodes for solid oxide fuel cells. To increase the deposition rate and improve the quality of the sputtered thin oxide films, asymmetric bipolar pulse magnetron sputtering was applied. Three types of anode-supported cells, with single-layer YSZ or CGO and YSZ/CGO bilayer electrolyte, were prepared and investigated. Optimal thickness of oxide layers was determined experimentally. Based on the electrochemical characteristics of the cells, it is shown that, at lower operating temperatures of 650°C to 700°C, the cells with single-layer CGO electrolyte are most effective. The power density of these fuel cells exceeds that of the cell based on YSZ single-layer electrolyte at the same temperature. Power densities of 650 mW cm-2 and 500 mW cm-2 at 700°C were demonstrated by cells with single-layer YSZ and CGO electrolyte, respectively. Significantly enhanced maximum power density was achieved in a bilayer-electrolyte single cell, as compared with cells with a single electrolyte layer. Maximum power density of 1.25 W cm-2 at 800°C and 1 W cm-2 at 750°C under voltage of 0.7 V were achieved for the YSZ/CGO bilayer electrolyte cell with YSZ and CGO thickness of about 4 μm and 1.5 μm, respectively. This signifies that the YSZ thin film serves as a blocking layer to prevent electrical current leakage in the CGO layer, leading to the overall enhanced performance. This performance is comparable to the state of the art for cells based on YSZ/CGO bilayer electrolyte.

  5. Magnetron sputtered nanostructured cadmium oxide films for ammonia sensing

    SciTech Connect

    Dhivya, P.; Prasad, A.K.; Sridharan, M.

    2014-06-01

    Nanostructured cadmium oxide (CdO) films were deposited on to glass substrates by reactive dc magnetron sputtering technique. The depositions were carried out for different deposition times in order to obtain films with varying thicknesses. The CdO films were polycrystalline in nature with cubic structure showing preferred orientation in (1 1 1) direction as observed by X-ray diffraction (XRD). Field-emission scanning electron microscope (FE-SEM) micrographs showed uniform distribution of grains of 30–35 nm size and change in morphology from spherical to elliptical structures upon increasing the film thickness. The optical band gap value of the CdO films decreased from 2.67 to 2.36 eV with increase in the thickness. CdO films were deposited on to interdigitated electrodes to be employed as ammonia (NH{sub 3}) gas sensor. The fabricated CdO sensor with thickness of 294 nm has a capacity to detect NH{sub 3} as low as 50 ppm at a relatively low operating temperature of 150 °C with quick response and recovery time. - Highlights: • Nanostructured CdO films were deposited on to glass substrates using magnetron sputtering. • Deposition time was varied in order to obtain films with different thicknesses. • The CdO films were polycrystalline in nature with preferred orientation along (1 1 1) direction. • The optical bandgap values of the films decreased on increasing the thickness of the films. • CdO films with different thickness such as 122, 204, 294 nm was capable to detect NH{sub 3} down to 50 ppm at operating temperature of 150 °C.

  6. PIC simulation of high efficiency and high power 14 vane industrial magnetron

    NASA Astrophysics Data System (ADS)

    Vyas, Sandeep; Maurya, Shivendra; Singh, V. V. P.

    2016-03-01

    This paper presents a 3D Particle in cell (PIC) simulation of a CW 2.450±0.050 GHz 10 kW industrial magnetron. The electromagnetic and PIC simulation of magnetron has been carried out using CST microwave studio andCST particle studio. A virtual prototype of 14 vane magnetron has been simulated on computer. The cold frequency of magnetron is found 2.495 GHz. The unloaded quality factor and circuit efficiency are found 1970 and 92% from electromagnetic simulation. The output power is achieved 12.4 KW for anode voltage 12.7 kV and magnetic field 2900 Gauss. The anode current is found anode current 1.22 A. The total efficiency is 78.76 %.

  7. Heat pipe - Design and fabrication for a magnetron and TWT of radar systems

    NASA Astrophysics Data System (ADS)

    Alesse, R.; Corsi, U.; Malagoli, G.

    1983-10-01

    The present investigation is concerned with an employment of heat pipes instead of local ventilator systems in two cases, including a magnetron and a traveling-wave tube (TWT). In the case of the magnetron utilizing a ventilation system, it was found that much noise was produced by the general ventilation system, the magnetron centrifugal fan, and the air motion in the magnetron. In order to solve the noise problem, the installation of heat pipes was considered. Details related to the design and the appropriate installation of the heat pipe are discussed. The second application of a heat pipe is related to the design of a cold plate for draining the heat generated by the operation of a 1200 W TWT in a naval cabinet. The achievement of a low noise level and a low TWT collector temperature were the objectives which led to the consideration of an employment of heat pipes in this case.

  8. Magnetron sputtering as a method of thin-film catalyst development for electrochemical sensors

    NASA Astrophysics Data System (ADS)

    Medvedeva, E. A.

    2016-07-01

    The aim of this work was to develop a thin-film Pt/C catalyst on the fluoroplastic substrates by means of the magnetron sputtering method in order to use as reference and working electrodes of electrochemical cells.

  9. CdS Film Thickness Characterization By R. F. Magnetron Sputtering

    SciTech Connect

    Hashim, Uda; Rahman, Kasim Abdul

    2009-06-01

    In this work, cadmium sulphide (CdS) target with 99.999% purity was used as a target in RF magnetron sputtering. The sputtering experiment was conducted onto silicon oxide substrates at different temperatures ranging from 200 deg. C to 400 deg. C in 50 deg. C steps, using a capacitive coupled magnetron cathode with 13.65 MHz that at higher magnetron power. After all investigations, it was concluded that 300 deg. C substrate temperature is suitable for producing CdS films on silicon wafer with RF magnetron sputtering and the examined properties (good crystallinity and low resistivity) of this film show its feasibility for technological purposes, especially for light sensor cells.

  10. Growth of fullerene-like carbon nitride thin solid films by reactive magnetron sputtering; role of low-energy ion irradiation in determining microstructure and mechanical properties

    NASA Astrophysics Data System (ADS)

    Neidhardt, J.; Czigány, Zs.; Brunell, I. F.; Hultman, L.

    2003-03-01

    Fullerene-like (FL) carbon nitride (CNx) films were deposited on Si (100) substrates by dc reactive, unbalanced, magnetron sputtering in a N2/Ar mixture from a high-purity pyrolythic graphite cathode in a dual-magnetron system with coupled magnetic fields. The N2 fraction in the discharge gas (0%-100%) and substrate bias (-25 V; -40 V) was varied, while the total pressure (0.4 Pa) and substrate temperature (450 °C) was kept constant. The coupled configuration of the magnetrons resulted in a reduced ion flux density, leading to a much lower average energy per incorporated particle, due to a less focused plasma as compared to a single magnetron. This enabled the evolution of a pronounced FL microstructure. The nitrogen concentration in the films saturated rapidly at 14-18 at. %, as determined by elastic recoil analysis, with a minor dependence on the discharge conditions. No correlations were detected between the photoelectron N1s core level spectra and the different microstructures, as observed by high-resolution electron microscopy. A variety of distinct FL structures were obtained, ranging from structures with elongated and aligned nitrogen-containing graphitic sheets to disordered structures, however, not exclusively linked to the total N concentration in the films. The microstructure evolution has rather to be seen as in equilibrium between the two competing processes of adsorption and desorption of nitrogen-containing species at the substrate. This balance is shifted by the energy and number of arriving species as well as by the substrate temperature. The most exceptional structure, for lower N2 fractions, consists of well-aligned, multi-layered circular features (nano-onions) with an inner diameter of approximately 0.7 nm and successive shells at a distance of ˜0.35 nm up to a diameter of 5 nm. It is shown that the intrinsic stress formation is closely linked with the evolution and accommodation of the heavily bent fullerene-like sheets. The FL CNx

  11. Additive manufactured Ti6Al4V scaffolds with the RF- magnetron sputter deposited hydroxyapatite coating

    NASA Astrophysics Data System (ADS)

    Chudinova, E.; Surmeneva, M.; Koptioug, A.; Scoglund, P.; Surmenev, R.

    2016-01-01

    Present paper reports on the results of surface modification of the additively manufactured porous Ti6Al4V scaffolds. Radio frequency (RF) magnetron sputtering was used to modify the surface of the alloy via deposition of the biocompatible hydroxyapatite (HA) coating. The surface morphology, chemical and phase composition of the HA-coated alloy were studied. It was revealed that RF magnetron sputtering allows preparing a homogeneous HA coating onto the entire surface of scaffolds.

  12. Dual Credit/Dual Enrollment and Data Driven Policy Implementation

    ERIC Educational Resources Information Center

    Lichtenberger, Eric; Witt, M. Allison; Blankenberger, Bob; Franklin, Doug

    2014-01-01

    The use of dual credit has been expanding rapidly. Dual credit is a college course taken by a high school student for which both college and high school credit is given. Previous studies provided limited quantitative evidence that dual credit/dual enrollment is directly connected to positive student outcomes. In this study, predictive statistics…

  13. Comparison of the damping and stiffness properties of 8wt% yttria stabilized zirconia ceramic coating deposited by the APS and EB-PVD techniques

    NASA Astrophysics Data System (ADS)

    Tassini, N.; Lambrinou, K.; Mircea, I.; Patsias, S.; Van der Biest, O.; Stanway, R.

    2005-05-01

    Recent research into the use of thermal barrier coatings has shown that they can provide sufficient additional damping, reducing vibration levels and significantly extending the life of the coated component. Various deposition techniques may be employed to apply ceramic coatings with Air Plasma Spraying (APS) and Electron Beam - Physical Vapour Deposition (EB-PVD) being the most widely used. However, one has to take into account that even when the starting ceramic material is the same, the microstructures of the resultant coatings depend strongly on the deposition technique. The objective of this paper is to study of the differences in the damping behaviour and stiffness of an yttria-stabilised zirconia (YSZ with 8%wt yttria) coating deposited by APS and by EB-PVD. Both damping and stiffness of these two YSZ coatings were estimated from tests performed at room and high temperatures. Moreover, this paper presents the microstructural characterisation of these two YSZ coatings using scanning electron microscopy, and attempts a correlation of the differences in their properties to their microstructure.

  14. Lithium ion conducting PVA:PVdF polymer electrolytes doped with nano SiO2 and TiO2 filler

    NASA Astrophysics Data System (ADS)

    Hema, M.; Tamilselvi, P.

    2016-09-01

    The effect of nano SiO2 and TiO2 fillers on the thermal, mechanical and electrochemical properties of PVA:PVdF:LiCF3SO3 have been investigated by three optimized systems of SPE (80PVA:20PVdF:15LiCF3SO3), CPE-I (SPE:8SiO2) and CPE-II (SPE:4TiO2). From the TGA curve least weight loss has been observed for CPE-II indicating high thermal stability compared to other systems. Stress-strain curve of the prepared samples confirm the enhancement of tensile strength in CPE-II compared to CPE-I and SPE. Conductivity studies show that addition of TiO2 filler slightly enhances ionic conductivity 3.7×10-3 S cm-1 compared to filler free system at 303 K. Dielectric plots have been analyzed and CPE-II possesses higher dielectric constant compared to CPE-I and filler free system. Temperature dependence of modulus plots has been studied for highest conductivity possessing sample. Wider electrochemical stability has been obtained for nano-composite polymer electrolytes. The results conclude that the prepared CPE-II shows the best performance and it will be well suited for lithium ion batteries.

  15. GEP-based method to formulate adhesion strength and hardness of Nb PVD coated on Ti-6Al-7Nb aimed at developing mixed oxide nanotubular arrays.

    PubMed

    Rafieerad, A R; Bushroa, A R; Nasiri-Tabrizi, B; Fallahpour, A; Vadivelu, J; Musa, S N; Kaboli, S H A

    2016-08-01

    PVD process as a thin film coating method is highly applicable for both metallic and ceramic materials, which is faced with the necessity of choosing the correct parameters to achieve optimal results. In the present study, a GEP-based model for the first time was proposed as a safe and accurate method to predict the adhesion strength and hardness of the Nb PVD coated aimed at growing the mixed oxide nanotubular arrays on Ti67. Here, the training and testing analysis were executed for both adhesion strength and hardness. The optimum parameter combination for the scratch adhesion strength and micro hardness was determined by the maximum mean S/N ratio, which was 350W, 20 sccm, and a DC bias of 90V. Results showed that the values calculated in the training and testing in GEP model were very close to the actual experiments designed by Taguchi. The as-sputtered Nb coating with highest adhesion strength and microhardness was electrochemically anodized at 20V for 4h. From the FESEM images and EDS results of the annealed sample, a thick layer of bone-like apatite was formed on the sample surface after soaking in SBF for 10 days, which can be connected to the development of a highly ordered nanotube arrays. This novel approach provides an outline for the future design of nanostructured coatings for a wide range of applications. PMID:26874249

  16. Heavy ion irradiation of UMo/Al samples PVD coated with Si and ZrN layers

    NASA Astrophysics Data System (ADS)

    Jungwirth, R.; Zweifel, T.; Chiang, H.-Y.; Petry, W.; Van den Berghe, S.; Leenaers, A.

    2013-03-01

    Excessive U-Al interdiffusion hampers the development of UMo/Al based disperse fuel since several years. As a remedy, addition of diffusion limiting elements to the UMo (Zr) or the Al matrix (Si) has been suggested. First test irradiations showed promising results. However, not the full amount of third element addition to the UMo or the Al contributes to the prevention of interdiffusion layer formation. Therefore, surface engineering of UMo particles, i.e. coating of UMo powder with diffusion limiting elements using DC magnetron sputtering, has been suggested. Thereby the diffusion blockers are applied directly where they are needed: at the interface between the UMo and the Al. For this study, samples from full size plates produced with UMo powder coated with Si (300 nm and 600 nm) and ZrN (1000nm) have been examined before and after irradiation with Iodine at 80 MeV. In case of Si coated UMo particles, a dense Si rich layer developed around the UMo particles during plate fabrication. However, the ZrN layer frequently revealed cracks but no interaction with the Al matrix or the UMo occurred. During heavy ion irradiation, no UMo/Al interdiffusion occurred at spots that are protected by a sufficiently thick Si rich layer or a non-cracked ZrN layer. In contrast, a conventional UMo/Al interdiffusion layer (IDL) occurred at spots where the UMo has not been protected by a Si rich layer or the ZrN layer was broken.

  17. DEPOSITION OF NIOBIUM AND OTHER SUPERCONDUCTING MATERIALS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING: CONCEPT AND FIRST RESULTS

    SciTech Connect

    High Current Electronics Institute, Tomsk, Russia; Anders, Andre; Mendelsberg, Rueben J.; Lim, Sunnie; Mentink, Matthijs; Slack, Jonathan L.; Wallig, Joseph G.; Nollau, Alexander V.; Yushkov, Georgy Yu.

    2011-07-24

    Niobium coatings on copper cavities have been considered as a cost-efficient replacement of bulk niobium RF cavities, however, coatings made by magnetron sputtering have not quite lived up to high expectations due to Q-slope and other issues. High power impulse magnetron sputtering (HIPIMS) is a promising emerging coatings technology which combines magnetron sputtering with a pulsed power approach. The magnetron is turned into a metal plasma source by using very high peak power density of ~ 1 kW/cm{sup 2}. In this contribution, the cavity coatings concept with HIPIMS is explained. A system with two cylindrical, movable magnetrons was set up with custom magnetrons small enough to be inserted into 1.3 GHz cavities. Preliminary data on niobium HIPIMS plasma and the resulting coatings are presented. The HIPIMS approach has the potential to be extended to film systems beyond niobium, including other superconducting materials and/or multilayer systems.

  18. Direct-current magnetron sputtering for optical coatings

    NASA Astrophysics Data System (ADS)

    Lagana, Paolo; Misiano, Carlo; Simonetti, Enrico

    1994-09-01

    The advantages of optical coatings realized by Sputtering versus thermal evaporation by crucible or Electron Gun, are very well known, but this technique is used only partially for dielectric coatings despite of a wide use in semiconductors and microcircuits, due to the slowness of RF Sputtering processes when starting from dielectric targets. This paper describes a DC Reactive Magnetron Sputtering technique from metal target set up at Ce.Te.V. for deposition of multilayer coatings, with cycle times comparable-or even faster-than conventional solution. The advantages of this process consist in obtaining films with high optical and mechanical performances with high repeatability on room temperature substrates. Pumping cycle can thus be faster and dead time for substrates heating and cooling down can be avoided, characteristics which plastic substrates can particularly take advantage of. Performances of the realized coatings on glass and plastic substrates, together with cycle time and material costs, are finally compared to results obtainable by Electron Beam Gun Reactive Deposition.

  19. Plasma parameters of an active cathode during relativistic magnetron operation

    NASA Astrophysics Data System (ADS)

    Hadas, Y.; Kweller, T.; Sayapin, A.; Krasik, Ya. E.; Bernshtam, V.

    2009-09-01

    The results of time- and space-resolved spectroscopic studies of the plasma produced at the surface of the ferroelectric cathode during the operation of an S-band relativistic magnetron generating ˜50 MW microwave power at f =3005 MHz and powered by a linear induction accelerator (LIA) (150 kV, 1.5 kA, 250 ns) are presented. The surface plasma was produced by a driving pulse (3 kV, 150 ns) prior to the application of the LIA accelerating high-voltage pulse. The cathode plasma electron density and temperature were obtained by analyzing hydrogen Hα and Hβ, and carbon ions CII and CIII spectral lines, and using the results of nonstationary collision radiative modeling. It was shown that the microwave generation causes an increase in plasma ion and electron temperature up to ˜4 and ˜7 eV, respectively, and the plasma density increases up to ˜7×1014 cm-3. Estimates of the plasma transport parameters and its interaction with microwave radiation are also discussed.

  20. Electron transport in magnetrons by a posteriori Monte Carlo simulations

    NASA Astrophysics Data System (ADS)

    Costin, C.; Minea, T. M.; Popa, G.

    2014-02-01

    Electron transport across magnetic barriers is crucial in all magnetized plasmas. It governs not only the plasma parameters in the volume, but also the fluxes of charged particles towards the electrodes and walls. It is particularly important in high-power impulse magnetron sputtering (HiPIMS) reactors, influencing the quality of the deposited thin films, since this type of discharge is characterized by an increased ionization fraction of the sputtered material. Transport coefficients of electron clouds released both from the cathode and from several locations in the discharge volume are calculated for a HiPIMS discharge with pre-ionization operated in argon at 0.67 Pa and for very short pulses (few µs) using the a posteriori Monte Carlo simulation technique. For this type of discharge electron transport is characterized by strong temporal and spatial dependence. Both drift velocity and diffusion coefficient depend on the releasing position of the electron cloud. They exhibit minimum values at the centre of the race-track for the secondary electrons released from the cathode. The diffusion coefficient of the same electrons increases from 2 to 4 times when the cathode voltage is doubled, in the first 1.5 µs of the pulse. These parameters are discussed with respect to empirical Bohm diffusion.

  1. Harmonic Generation in the Multifrequency Recirculating Planar Magnetron

    NASA Astrophysics Data System (ADS)

    Exelby, S. C.; Greening, G. B.; Jordan, N. M.; Simon, D.; Zhang, P.; Lau, Y. Y.; Gilgenbach, R. M.

    2015-11-01

    The Multifrequency Recirculating Planar Magnetron (MFRPM) is a high power microwave source adapted from the Recirculating Planar Magnetrona, currently under investigation at the University of Michigan. The device features 2 dissimilar periodic structures allowing for the generation of (L-band) 1- and (S-band) 2-GHz high power microwave pulses simultaneously. These distinct frequencies offer the potential for variable coupling for defense applications, such as counter-IED. Experiments have been performed on the RPM, driven by the Michigan Electron Long Beam Accelerator with a Ceramic insulator (MELBA-C) using a -300kV, 1-10 kA, 0.3-1.0 us pulse applied to the cathode. Using the Mode Control Cathodeb and a coax-to-waveguide extraction system, the MFRPM has demonstrated simultaneous production of 20 MW at 1 GHz and 10 MW at 2 GHz. The L-band oscillator also produced both 2- and 4-GHz oscillations when the S-band oscillator turns on. These harmonics persist after the S-band oscillator turns off. Ongoing work will attempt to isolate these harmonics to measure the power accurately and confirm these observations. Supported by the Office of Naval Research grant no. N00014-13-1-0566 and L-3 Communications.

  2. Rhodium coated mirrors deposited by magnetron sputtering for fusion applications.

    PubMed

    Marot, L; De Temmerman, G; Oelhafen, P; Covarel, G; Litnovsky, A

    2007-10-01

    Metallic mirrors will be essential components of all optical spectroscopy and imaging systems for ITER plasma diagnostics. Any change in the mirror performance, in particular, its reflectivity, due to erosion of the surface by charge exchange neutrals or deposition of impurities will influence the quality and reliability of the detected signals. Due to its high reflectivity in the visible wavelength range and its low sputtering yield, rhodium appears as an attractive material for first mirrors in ITER. However, the very high price of the raw material calls for using it in the form of a film deposited onto metallic substrates. The development of a reliable technique for the preparation of high reflectivity rhodium films is therefore of the highest importance. Rhodium layers with thicknesses of up to 2 microm were produced on different substrates of interest (Mo, stainless steel, Cu) by magnetron sputtering. Produced films exhibit a low roughness and crystallite size of about 10 nm with a dense columnar structure. No impurities were detected on the surface after deposition. Scratch tests demonstrate that adhesion properties increase with substrate hardness. Detailed optical characterizations of Rh-coated mirrors as well as results of erosion tests performed both under laboratory conditions and in the TEXTOR tokamak are presented in this paper. PMID:17979419

  3. Rhodium coated mirrors deposited by magnetron sputtering for fusion applications

    SciTech Connect

    Marot, L.; De Temmerman, G.; Oelhafen, P.; Covarel, G.; Litnovsky, A.

    2007-10-15

    Metallic mirrors will be essential components of all optical spectroscopy and imaging systems for ITER plasma diagnostics. Any change in the mirror performance, in particular, its reflectivity, due to erosion of the surface by charge exchange neutrals or deposition of impurities will influence the quality and reliability of the detected signals. Due to its high reflectivity in the visible wavelength range and its low sputtering yield, rhodium appears as an attractive material for first mirrors in ITER. However, the very high price of the raw material calls for using it in the form of a film deposited onto metallic substrates. The development of a reliable technique for the preparation of high reflectivity rhodium films is therefore of the highest importance. Rhodium layers with thicknesses of up to 2 {mu}m were produced on different substrates of interest (Mo, stainless steel, Cu) by magnetron sputtering. Produced films exhibit a low roughness and crystallite size of about 10 nm with a dense columnar structure. No impurities were detected on the surface after deposition. Scratch tests demonstrate that adhesion properties increase with substrate hardness. Detailed optical characterizations of Rh-coated mirrors as well as results of erosion tests performed both under laboratory conditions and in the TEXTOR tokamak are presented in this paper.

  4. Magnetron sputtered WS2; optical and structural analysis

    NASA Astrophysics Data System (ADS)

    Koçak, Y.; Akaltun, Y.; Gür, Emre

    2016-04-01

    Remarkable properties of graphene have renewed interest in inorganic, Transition Metal Dichalgogenits (TMDC) due to unique electronic and optical properties. TMDCs such as MoS2, MoSe2, WS2 and WSe2 have sizable bandgaps that change from indirect to direct in single layers, allowing applications such as solar cells, transistors, photodetectors and electroluminescent devices in which the graphene is not actively used. So, fabrication and analysis of these films are important for new generation devices. In this work, polycrystalline WS2 films were grown by radio frequency magnetron sputtering (RFMS) on different substrates like n-Si(100), n-Si(111), p-Si(100), glass and fused silica. Structural, morphological, optical and electrical properties were investigated as a function of film thickness and RF power. From XRD analysis, signals from planes of (002), (100), (101), (110), (008) belong to the hegzagonal WS2 were obtained. Raman spectra of the WS2 show that there are two dominant peaks at ~351 cm-1 (in-plane phonon mode) and ~417 cm-1 (out-of-plane phonon mode). XPS analysis of the films has shown that binding energy and the intensity of tungsten 4f shells shifts by depending on the depth of the films which might be due to the wellknown preferential sputtering.

  5. The bioactivity mechanism of magnetron sputtered bioglass thin films

    NASA Astrophysics Data System (ADS)

    Berbecaru, C.; Stan, G. E.; Pina, S.; Tulyaganov, D. U.; Ferreira, J. M. F.

    2012-10-01

    Smooth and adherent bioactive coatings with ∼0.5 μm thickness were deposited onto Si substrates by the radiofrequency-magnetron sputtering method at 150 °C under 0.4 Pa of Ar atmosphere using a bioglass powder as target with a composition in the SiO2-CaO-MgO-P2O5-CaF2-B2O3-Na2O system. The bioactivity of the as-prepared bioglass samples was assessed by immersion in simulated body fluid for different periods of time up to 30 days. Grazing incidence X-ray diffraction, Fourier transform infra-red spectrometry and energy dispersive spectroscopy revealed that important structural and compositional changes took place upon immersing the samples in SBF. Whilst the excellent biomineralisation capability of the BG thin films was demonstrated by the in vitro induction of extensive and homogenous crystalline hydroxyapatite in-growths on their surfaces, a series of bioactivity process kinetics peculiarities (derogations from the classical model) were emphasised and thoroughly discussed.

  6. Optical Properties of Magnetron sputtered Nickel Thin Films

    NASA Astrophysics Data System (ADS)

    Twagirayezu, Fidele; Geerts, Wilhelmus J.; Cui, Yubo

    2015-03-01

    The study of optical properties of Nickel (Ni) is important, given the pivotal role it plays in the semiconductor and nano-electronics technology. Ni films were made by DC and RF magnetron sputtering in an ATC Orion sputtering system of AJA on various substrates. The optical properties were studied ex situ by variable angle spectroscopic (220-1000 nm) ellipsometry at room temperature. The data were modeled and analyzed using the Woollam CompleteEase Software fitting ellipsometric and transmission data. Films sputtered at low pressure have optical properties similar to that of Palik. Films sputtered at higher pressure however have a lower refraction index and extinction coefficient. It is expected from our results that the density of the sputtered films can be determined from the ellipsometric quantities. Our experiments also revealed that Ni is susceptible to a slow oxidation changing its optical properties over the course of several weeks. The optical properties of the native oxide differ from those of reactive sputtered NiO similar as found by. Furthermore the oxidation process of our samples is characterized by at least two different time constants.

  7. Discharge Physics of High Power Impulse Magnetron Sputtering

    SciTech Connect

    Anders, Andre

    2010-10-13

    High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is put on the current-voltage-time relationships near the threshold of self-sputtering runaway. The great variety of current pulse shapes delivers clues on the very strong gas rarefaction, self-sputtering runaway conditions, and the stopping of runaway due to the evolution of atom ionization and ion return probabilities as the gas plasma is replaced by metal plasma. The discussions are completed by considering instabilities and the special case of ?gasless? self-sputtering.

  8. A bulk plasma model for dc and HiPIMS magnetrons

    NASA Astrophysics Data System (ADS)

    Brenning, N.; Axnäs, I.; Raadu, M. A.; Lundin, D.; Helmerson, U.

    2008-11-01

    A plasma discharge model has been developed for the bulk plasma (also called the extended presheath) in sputtering magnetrons. It can be used both for high power impulse magnetron sputtering (HiPIMS) and conventional dc sputtering magnetrons. Demonstration calculations are made for the parameters of the HiPIMS sputtering magnetron at Linköping University, and also benchmarked against results in the literature on dc magnetrons. New insight is obtained regarding the structure and time development of the currents, the electric fields and the potential profiles. The transverse resistivity ηbottom has been identified as having fundamental importance both for the potential profiles and for the motion of ionized target material through the bulk plasma. New findings are that in the HiPIMS mode, as a consequence of a high value of ηbottom, (1) there can be an electric field reversal that in our case extends 0.01-0.04 m from the target, (2) the electric field in the bulk plasma is typically an order of magnitude weaker than in dc magnetrons, (3) in the region of electric field reversal the azimuthal current is diamagnetic in nature, i.e. mainly driven by the electron pressure gradient, and actually somewhat reduced by the electron Hall current which here has a reversed direction and (4) the azimuthal current above the racetrack can, through resistive friction, significantly influence the motion of the ionized fraction of the sputtered material and deflect it sideways, away from the target and towards the walls of the magnetron.

  9. Comparative Study of Cu Films Prepared by DC, High-Power Pulsed and Burst Magnetron Sputtering

    NASA Astrophysics Data System (ADS)

    Solovyev, A. A.; Oskirko, V. O.; Semenov, V. A.; Oskomov, K. V.; Rabotkin, S. V.

    2016-05-01

    A comparative study of deposition rate, adhesion, structural and electrical properties of nanocrystalline copper thin films deposited using direct current magnetron sputtering (DCMS) and different regimes of high power pulsed magnetron sputtering is presented. High-power impulse magnetron sputtering (HIPIMS) and burst regime (pulse packages) of magnetron sputtering are investigated. The ion and atomic flows toward the growing film during magnetron sputtering of a Cu target are determined. X-ray diffraction, scanning electron microscopy and atomic force microscopy were used to observe the structural characterization of the films. The resistivity of the films was measured using four-point probe technique. In all sputtering regimes, Cu films have mixture crystalline orientations of [111], [200], [311] and [220] in the direction of the film growth. As peak power density in studied deposition regimes was different in order of magnitude (from 15 W/cm2 in DC regime to 3700 W/cm2 in HIPIMS), film properties were also greatly different. DCMS Cu films exhibit a porous columnar grain structure. In contrast, HIPIMS Cu films have a slightly columnar and denser composition. Cu films deposited using burst regimes at peak power density of 415 W cm-2 and ion-to-atom ratio of about 5 have the densest composition and smallest electrical resistance.

  10. Comparing a 2D fluid model of the DC planar magnetron cathode to experiments

    SciTech Connect

    Garcia, M.

    1996-05-01

    Planar magnetron cathodes have arching magnetic field lines which concentrate plasma density near the electrode surface. This enhances the ion bombardment of the surface and the yield of sputtered atoms. Magnetron cathodes are used in the Plasma Electrode Pockels Cell (PEPC) devices of the Laser Program because they provide for significantly higher conduction than do glow discharges. An essential feature of magnetron cathodes is that the vector product of the perpendicular electric field, E[sub y], with the parallel component of the magnetic field, B[sub x], forms a closed track with a circulating current along the cathode surface. An analytical, 2D, two component, quasi-neutral, continuum model yields formulas for the plasma density, the total and component current densities, the electric field, and the positive electrical potential, between the cathode surface and a distant, uniform plasma. For a specific gas, the free parameters are electron temperature, gas number density, and total current. The model is applied to the interpretation of experimental data from the PEPC device, as well as a small vacuum facility for testing magnetron cathodes. Finally, the model has been applied to generate cross sectional views of a PEPC magnetron cathode track.

  11. Comparative Study of Cu Films Prepared by DC, High-Power Pulsed and Burst Magnetron Sputtering

    NASA Astrophysics Data System (ADS)

    Solovyev, A. A.; Oskirko, V. O.; Semenov, V. A.; Oskomov, K. V.; Rabotkin, S. V.

    2016-08-01

    A comparative study of deposition rate, adhesion, structural and electrical properties of nanocrystalline copper thin films deposited using direct current magnetron sputtering (DCMS) and different regimes of high power pulsed magnetron sputtering is presented. High-power impulse magnetron sputtering (HIPIMS) and burst regime (pulse packages) of magnetron sputtering are investigated. The ion and atomic flows toward the growing film during magnetron sputtering of a Cu target are determined. X-ray diffraction, scanning electron microscopy and atomic force microscopy were used to observe the structural characterization of the films. The resistivity of the films was measured using four-point probe technique. In all sputtering regimes, Cu films have mixture crystalline orientations of [111], [200], [311] and [220] in the direction of the film growth. As peak power density in studied deposition regimes was different in order of magnitude (from 15 W/cm2 in DC regime to 3700 W/cm2 in HIPIMS), film properties were also greatly different. DCMS Cu films exhibit a porous columnar grain structure. In contrast, HIPIMS Cu films have a slightly columnar and denser composition. Cu films deposited using burst regimes at peak power density of 415 W cm-2 and ion-to-atom ratio of about 5 have the densest composition and smallest electrical resistance.

  12. Preparation and characterization on nano-hybrid composite solid polymer electrolyte of PVdF-HFP /MG49-ZrO{sub 2} for battery application

    SciTech Connect

    Lee, T. K.; Ahmad, A.; Hasyareeda, N.

    2014-09-03

    Initial study on nano composite polymer electrolyte of PVdF-HFP/MG49-ZrO{sub 2} has been done. The zirconium was synthesis via in-situ sol-gel method in a dissolved polymer blends. The effects of different concentrations of zirconium and pH values have been investigated on nano composite polymer (NCP). Analysis impedance show that only at 6 wt. % of zirconium for all pH values show a semi-circle arc which have lowest value of bulk resistance. No ionic conductivity value is obtain due to the absent of ion charge carriers. Analysis of XRD revealed that crystallinity phase of the nano composite polymer was affect by different pH values. However, no significant changes have been observed in IR bands. This could well indicate that different pH medium did not affect the chemical bonding in the structure.

  13. Preparation and characterization on nano-hybrid composite solid polymer electrolyte of PVdF-HFP /MG49-ZrO2 for battery application

    NASA Astrophysics Data System (ADS)

    Lee T., K.; Ahmad, A.; Hasyareeda, N.

    2014-09-01

    Initial study on nano composite polymer electrolyte of PVdF-HFP/MG49-ZrO2 has been done. The zirconium was synthesis via in-situ sol-gel method in a dissolved polymer blends. The effects of different concentrations of zirconium and pH values have been investigated on nano composite polymer (NCP). Analysis impedance show that only at 6 wt. % of zirconium for all pH values show a semi-circle arc which have lowest value of bulk resistance. No ionic conductivity value is obtain due to the absent of ion charge carriers. Analysis of XRD revealed that crystallinity phase of the nano composite polymer was affect by different pH values. However, no significant changes have been observed in IR bands. This could well indicate that different pH medium did not affect the chemical bonding in the structure.

  14. X-Ray Diffraction Pattern and Optical Properties Of Disperse Red-1 Thin Films Deposited By Electric Field Assisted PVD Method

    NASA Astrophysics Data System (ADS)

    Wenas, D. R.; Herman, Herman; Siregar, R. E.; Tjia, M. O.

    2010-07-01

    Disperse Red-1 (DR1) films have been prepared by Electric field-assisted Physical Vapor Deposition (E-PVD) method at various external electric field strengths on the ITO substrate. The resulted films were characterized by X-ray diffraction spectroscopy and the optical properties are investigated by Reflectometric and ATR measurements. The XRD data show growing diffraction peaks with increasing electric field corresponding to increasing number of molecules deposited with the head-to-tail stacking along the molecular chain. Further, the reflectometer data show a rising trend of the optical refractive index of the films produced with increasing electric field. This result is consistent with the frequency shift of SPR (Surface Plasmon Resonance) measured by ATR method.

  15. Impact of ethylene carbonate on ion transport characteristics of PVdF-AgCF{sub 3}SO{sub 3} polymer electrolyte system

    SciTech Connect

    Austin Suthanthiraraj, S.; Joice Sheeba, D.; Joseph Paul, B.

    2009-07-01

    The ionic transport in thin film plasticized polymer electrolytes based on polyvinylidene fluoride (PVdF) as the polymer host, silver triflate (AgCF{sub 3}SO{sub 3}) as salt and ethylene carbonate (EC) as plasticizer prepared by solution casting technique has been reported. Addition of silver triflate has resulted in an increase in the room temperature (298 K) electrical conductivity of the polymer from 10{sup -6} to 10{sup -5} S cm{sup -1} whereas incorporation of EC as the plasticizer has further enhanced the conductivity value by an order of magnitude to 10{sup -4} S cm{sup -1} owing to the possible decrease in crystallinity of the polymer matrix as revealed by the detailed temperature-dependent complex impedance, silver ionic transference number, Fourier transform infrared and X-ray diffraction measurements.

  16. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NASA Astrophysics Data System (ADS)

    van Hattum, E. D.

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology, where the SiOx layer is used as the charge retention layer on the drums for copying and printing devices. The thesis describes investigations of the plasma and of processes taking place on the sputter target and on the SiOx growth surface in the room temperature, RF reactive magnetron plasma sputter deposition technology. The sputtering target consists of silicon and the reactive atmosphere consists of an Ar/O2 mixture. The composition of the grown SiOx layers has been varied between x=0 and x=2 by variation of the O2 partial pressure. The characteristics of the growth process have been related to the nanostructural properties of the grown films. The deposition system enables the characterisation of the plasma (Langmuir probe, energy resolved mass spectrometer) and of the growing film (Elastic Recoil Detection (ERD), Fourier transform infrared absorption spectroscopy) and is connected to a beamline of a 6MV tandem van de Graaff accelerator. Also Rutherford Backscattering Spectrometry and X-ray Photoelectron Spectroscopy have been applied. It is shown how ERD can be used as a real-time in-situ technique. The thesis presents spatially resolved values of the ion density, electron temperature and the quasi-electrostatic potential, determined using a Langmuir probe. The plasma potential has a maximum about 2 cm from the cathode erosion area, and decreases (more than 200 V typically) towards the floating sputter cathode. The potential decreases slightly in the direction towards the grounded growth surface and the positive, mainly Ar+, ions created in the large volume of the plasma closest to the substrate are accelerated towards the growth surface. These ions obtain a few eV of

  17. Dual-modality imaging

    NASA Astrophysics Data System (ADS)

    Hasegawa, Bruce; Tang, H. Roger; Da Silva, Angela J.; Wong, Kenneth H.; Iwata, Koji; Wu, Max C.

    2001-09-01

    In comparison to conventional medical imaging techniques, dual-modality imaging offers the advantage of correlating anatomical information from X-ray computed tomography (CT) with functional measurements from single-photon emission computed tomography (SPECT) or with positron emission tomography (PET). The combined X-ray/radionuclide images from dual-modality imaging can help the clinician to differentiate disease from normal uptake of radiopharmaceuticals, and to improve diagnosis and staging of disease. In addition, phantom and animal studies have demonstrated that a priori structural information from CT can be used to improve quantification of tissue uptake and organ function by correcting the radionuclide data for errors due to photon attenuation, partial volume effects, scatter radiation, and other physical effects. Dual-modality imaging therefore is emerging as a method of improving the visual quality and the quantitative accuracy of radionuclide imaging for diagnosis of patients with cancer and heart disease.

  18. High peak power gyroklystron with an inverted magnetron injection gun

    SciTech Connect

    Read, Michael E.; Lawson, Wesley; Miram, George; Marsden, David; Borchard, Philipp

    2005-12-01

    Calabazas Creek Research Inc. (CCR) has investigated the feasibility of a 30 GHz gyroklystron amplifier for driving advanced accelerators. Gyroklystrons have been shown to be efficient sources of high power radiation at frequencies above X-Band and are, therefore, well suited for driving high frequency accelerators. CCR's gyroklystron design includes a novel inverted magnetron injection gun (MIG) that allows support and cooling of the coaxial inner conductor of the circuit. This novel gun provides a very high quality electron beam, making it possible to achieve a cavity design with an efficiency of 54%. During Phase I, it was determined that the original frequency of 17 GHz was no longer well matched to the potential market. A survey of accelerator needs identified the Compact Linear Collider (CLIC) as requiring 30 GHz sources for testing of accelerator structures. Developers at CLIC are seeking approximately 25 MW per tube. This will result in the same power density as in the original 80 MW, 17 GHz device and will thus have essentially the same risk. CLIC will require initially 3-4 tubes and eventually 12-16 tubes. This quantity represents $5M-$10M in sales. In addition, gyroklystrons are of interest for radar systems and electron paramagnetic resonance (EPR) instruments. Following discussions with the Department of Energy, it was determined that changing the program goal to the CLIC requirement was in the best interest of CCR and the funding agency. The Phase I program resulted in a successful gyroklystron design with a calculated efficiency of 54% with an output power of 33 MW. Design calculations for all critical components are complete, and no significant technical issues remain.

  19. : comparison between magnetron sputtering and sol-gel synthesis

    NASA Astrophysics Data System (ADS)

    Cosentino, S.; Knebel, S.; Mirabella, S.; Gibilisco, S.; Simone, F.; Bracht, H.; Wilde, G.; Terrasi, A.

    2014-07-01

    SiGeO films have been produced by a sol-gel derived approach and by magnetron sputtering deposition. Post-thermal annealing of SiGeO films in forming gas or nitrogen atmosphere between 600 and 900 °C ensured the phase separation of the SiGeO films and synthesis and growth of Ge nanoclusters (NCs) embedded in SiO2. Rutherford backscattering spectrometry analysis evidenced a similar Ge concentration (~12 %), but a different Ge out-diffusion after annealing between the two types of techniques with the formation of a pure SiO2 surface layer (~30 nm thick) in sol-gel samples. The thermal evolution of Ge NCs has been followed by transmission electron microscopy and Raman analysis. In both samples, Ge NCs form with similar size increase (from ~3 up to ~7 nm) and with a concomitant amorphous to crystalline transition in the 600-800 °C temperature range. Despite a similar Ge concentration, a significant lower NCs density is observed in sol-gel samples attributed to an incomplete precipitation of Ge, which probably remains still dispersed in the matrix. The optical absorption of Ge NCs has been measured by spectrophotometry analyses. Ge NCs produced by the sol-gel method evidence an optical band gap of around 2 eV, larger than that of NCs produced by sputtering (~1.5 eV). These data are presented and discussed also considering the promising implications of a low-cost sol-gel based technique towards the fabrication of light harvesting devices based on Ge nanostructures.

  20. Dual Species NMR Oscillator

    NASA Astrophysics Data System (ADS)

    Weber, Joshua; Korver, Anna; Thrasher, Daniel; Walker, Thad

    2016-05-01

    We present progress towards a dual species nuclear magnetic oscillator using synchronous spin exchange optical pumping. By applying the bias field as a sequence of alkali 2 π pulses, we generate alkali polarization transverse to the bias field. The alkali polarization is then modulated at the noble gas resonance so that through spin exchange collisions the noble gas becomes polarized. This novel method of NMR suppresses the alkali field frequency shift by at least a factor of 2500 as compared to longitudinal NMR. We will present details of the apparatus and measurements of dual species co-magnetometry using this method. Research supported by the NSF and Northrop-Grumman Corp.

  1. Dual-Mode Combustor

    NASA Technical Reports Server (NTRS)

    Trefny, Charles J (Inventor); Dippold, Vance F (Inventor)

    2013-01-01

    A new dual-mode ramjet combustor used for operation over a wide flight Mach number range is described. Subsonic combustion mode is usable to lower flight Mach numbers than current dual-mode scramjets. High speed mode is characterized by supersonic combustion in a free-jet that traverses the subsonic combustion chamber to a variable nozzle throat. Although a variable combustor exit aperture is required, the need for fuel staging to accommodate the combustion process is eliminated. Local heating from shock-boundary-layer interactions on combustor walls is also eliminated.

  2. Dual Funding for Dual Enrollment: An Inducement or an Impediment?

    ERIC Educational Resources Information Center

    Hunt, Erika

    2007-01-01

    While the strategy of funding both systems provides an incentive for both school districts and community colleges to participate with dual enrollment, the current fiscal environment has drawn attention to the inefficient use of the dual funding structure. This article highlights the results of a case study on Florida's dual enrollment program…

  3. Precision vector control of a superconducting RF cavity driven by an injection locked magnetron

    DOE PAGESBeta

    Chase, Brian; Pasquinelli, Ralph; Cullerton, Ed; Varghese, Philip

    2015-03-01

    The technique presented in this paper enables the regulation of both radio frequency amplitude and phase in narrow band devices such as a Superconducting RF (SRF) cavity driven by constant power output devices i.e. magnetrons [1]. The ability to use low cost high efficiency magnetrons for accelerator RF power systems, with tight vector regulation, presents a substantial cost savings in both construction and operating costs - compared to current RF power system technology. An operating CW system at 2.45 GHz has been experimentally developed. Vector control of an injection locked magnetron has been extensively tested and characterized with a SRFmore » cavity as the load. Amplitude dynamic range of 30 dB, amplitude stability of 0.3% r.m.s, and phase stability of 0.26 degrees r.m.s. has been demonstrated.« less

  4. Precision vector control of a superconducting RF cavity driven by an injection locked magnetron

    SciTech Connect

    Chase, Brian; Pasquinelli, Ralph; Cullerton, Ed; Varghese, Philip

    2015-03-01

    The technique presented in this paper enables the regulation of both radio frequency amplitude and phase in narrow band devices such as a Superconducting RF (SRF) cavity driven by constant power output devices i.e. magnetrons [1]. The ability to use low cost high efficiency magnetrons for accelerator RF power systems, with tight vector regulation, presents a substantial cost savings in both construction and operating costs - compared to current RF power system technology. An operating CW system at 2.45 GHz has been experimentally developed. Vector control of an injection locked magnetron has been extensively tested and characterized with a SRF cavity as the load. Amplitude dynamic range of 30 dB, amplitude stability of 0.3% r.m.s, and phase stability of 0.26 degrees r.m.s. has been demonstrated.

  5. Substrate heating rates for planar and cylindrical-post magnetron sputtering sources

    NASA Technical Reports Server (NTRS)

    Thornton, J. A.; Lamb, J. L.

    1984-01-01

    Results are presented for the substrate heating energy/atom required in the planar magnetron sputtering of Al, Cr, Ni, Cu, Mo, In, Ta, W, and Pt in Ar, as well as Al and Cr in O2. Data are also obtained for cylindrical magnetron sputtering of Nb, Ag, Ta, W, and Pb-Sn in Ar, and Mo sputtered in Ne, Ar, Kr, and Xe. Planar and cylindrical magnetron heating rates were comparable. Special experiments were conducted to examine the contributions to substrate heating of plasma species and ion neutralization and reflection at the cathode; the results obtained indicate that charged plasma species do not significantly contribute to the heating, but that neutralized and reflected ions play a significant role in the planar as well as cylindrical cases despite the differences in cathode geometry.

  6. Theoretical investigation of resonant frequencies of unstrapped magnetron with arbitrary side resonators

    SciTech Connect

    Yue, Song; Zhang, Zhao-chuan; Gao, Dong-ping

    2015-04-15

    In this paper, a sector steps approximation method is proposed to investigate the resonant frequencies of magnetrons with arbitrary side resonators. The arbitrary side resonator is substituted with a series of sector steps, in which the spatial harmonics of electromagnetic field are also considered. By using the method of admittance matching between adjacent steps, as well as field continuity conditions between side resonators and interaction regions, the dispersion equation of magnetron with arbitrary side resonators is derived. Resonant frequencies of magnetrons with five common kinds of side resonators are calculated with sector steps approximation method and computer simulation softwares, in which the results have a good agreement. The relative error is less than 2%, which verifies the validity of sector steps approximation method.

  7. Microwave impedance matching strategies of an applicator supplied by a bi-directional magnetron waveguide launcher.

    PubMed

    Roussy, Georges; Kongmark, Nils

    2003-01-01

    It is shown that a bi-directional waveguide launcher can be used advantageously for reducing the reflection coefficient mismatch of an input impedance of an applicator. In a simple bi-directional waveguide launcher, the magnetron is placed in the waveguide and generates a nominal field distribution with significant output impedance in both directions of the waveguide. If a standing wave is tolerated in the torus, which connects the launcher and the applicator, the power transfer from the magnetron to the applicator can be optimal, without using special matching devices. It is also possible to match the bi-directional launcher with two inductance stubs near the antenna of the magnetron and use them for supplying a two-input applicator without reflection. PMID:15323109

  8. Tungsten coatings deposited on CFC tiles by the combined magnetron sputtering and ion implantation technique

    NASA Astrophysics Data System (ADS)

    Ruset, C.; Grigore, E.; Maier, H.; Neu, R.; Li, X.; Dong, H.; Mitteau, R.; Courtois, X.

    2007-03-01

    Combined magnetron sputtering and ion implantation (CMSII) is a deposition technique involving simultaneous magnetron sputtering and high energy ion bombardment of the coating during its growth. A high voltage pulse discharge (U=40 kV, τ=20 μs, f=25 Hz) is superposed over the magnetron deposition and in this way, positive ions are accelerated to the components to be coated, bombarding initially the substrate and then the coating itself. In the framework of the ITER-like wall project this method was applied to produce nanostructured W coatings on the carbon fibre composite (CFC) substrate. These coatings have been characterized in terms of adhesion, thickness, structure and resistance to high thermal loads (up to 23.5 MW m-2). Based on the results of these tests, which are presented in this paper, CMSII technology was selected for coating about 1100 tiles with a 10 μm tungsten layer for the JET first wall and divertor.

  9. Setup for in situ X-ray diffraction studies of thin film growth by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Ellmer, K.; Mientus, R.; Weiß, V.; Rossner, H.

    2001-07-01

    A novel method is described for the in situ-investigation of nucleation and growth of thin films during magnetron sputtering. Energy dispersive X-ray diffraction with synchrotron light is used for the structural analysis during film growth. An in situ-magnetron sputtering chamber was constructed and installed at a synchrotron radiation beam line with a bending magnet. The white synchrotron light (1-70 keV) passes the sputtering chamber through Kapton windows and hits one of the substrates on a four-fold sample holder. The diffracted beam, observed under a fixed diffraction angle between 3° and 10°, is energy analyzed by a high purity Ge-detector. The in situ-EDXRD setup is demonstrated for the growth of tin-doped indium oxide (ITO) films prepared by reactive magnetron sputtering from a metallic target.

  10. Solid-state pulse modulator for a 1.7-MW X-band magnetron

    NASA Astrophysics Data System (ADS)

    Choi, Jaegu; Shin, Yong-Moon; Choi, Young-Wook; Kim, Kwan-Ho

    2014-05-01

    Medical linear accelerators (LINAC) for cancer treatment require pulse modulators to generate high-power pulses with a fast rise time, flat top and short duration to drive high-power magnetrons. Solid-state pulse modulators (SSPM) for medical LINACs that use high power semiconductor switches with high repetition rates, high stability and long lifetimes have been introduced to replace conventional linear-type pulse generators that use gaseous discharge switches. In this paper, the performance of a developed SSPM, which mainly consists of a capacitor charger, an insulatedgate bipolar transistor (IGBT)-capacitor stack and a pulse transformer, is evaluated with a dummy load and an X-band magnetron load. A theoretical analysis of the pulse transformer, which is a critical element of the SSPM, is carried out. The output pulse has a fast rise time and low droop, such that the modulator can drive the X-band magnetron.

  11. Electron prebunching in microwave magnetron by electric priming using anode shape modification

    SciTech Connect

    Kim, J.I.; Won, J.H.; Park, G.S.

    2005-04-25

    Electric priming is proposed for electron prebunching in a microwave magnetron and is demonstrated using a particle-in-cell code. When the N/2-fold perturbation of the radial electric field using an anode shape modification is imposed in the interaction space of the N-cavity magnetron along the azimuthal direction, the electrons initially develop into the desired {pi}-mode resulting in rapid startup. The startup is hastened from 3.2 to 1.2 ns when the radial variation of the protrusion and recession is 6.5% of the anode radius with the angular width of 6 deg.

  12. Modification of film structure by plasma potential control using triode high power pulsed magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Nakano, Takeo; Umahashi, Takuya; Baba, Shigeru

    2014-02-01

    We have designed a new triode configuration in a magnetron sputtering apparatus to control the plasma potential of the discharge. An additional chimney electrode was introduced above the conventional sputter gun to apply a positive voltage. The discharge power was provided by a pulse power source to achieve high power pulsed magnetron sputtering operation. We confirmed that the plasma potential increased with increasing positive electrode voltage. Copper films with substantially flatter surfaces could be obtained on a water-cooled and electrically grounded substrate at an Ar gas pressure of 5 Pa.

  13. Trajectory analysis of the electrons in a magnetron-type gun. Progress report

    SciTech Connect

    Ezzeddine, A.; Smullin, L.D.

    1980-09-01

    Modification is introduced in the Herrmannsfeldt electron trajectory code to analyze the trajectories in magnetron injection guns with perveances I/V/sup 3/2/ in the range of 10/sup -5/ Perv. When tested on a particular magnetron gun, the computed perveance agreed well with experimental data for values V/B/sup 2/ less that or equal to 0.006, the flow was nearly laminar with V/sub perpendicular//V/sub parallel/ values reaching 12%. For larger voltages, both experiment and calculations indicate a turbulent electron flow.

  14. Computer analysis, design and construction of the BNL Mk V magnetron

    SciTech Connect

    McKenzie-Wilson, R.B.; Kovarik, V.J.

    1981-01-01

    As part of a program to develop a high energy neutral beam injector for fusion reactor applications, the BNL Neutral Beam Group is studying, among other options, a surface plasma source of the magnetron type. This source has been developed to the point at which a large compact model, known as the Mk V magnetron, has been designed and constructed. The source is designed to operate in the steady state mode and to produce 1-2A of H/sup -/(D/sup -/) ions at 25 kV. Under these conditions, 18 KW of heat are removed from the source by the cooling system.

  15. Dual Coding in Children.

    ERIC Educational Resources Information Center

    Burton, John K.; Wildman, Terry M.

    The purpose of this study was to test the applicability of the dual coding hypothesis to children's recall performance. The hypothesis predicts that visual interference will have a small effect on the recall of visually presented words or pictures, but that acoustic interference will cause a decline in recall of visually presented words and…

  16. Early Dual Language Learning

    ERIC Educational Resources Information Center

    Genesee, Fred

    2008-01-01

    Parents and child care personnel in English-dominant parts of the world often express misgivings about raising children bilingually. Their concerns are based on the belief that dual language learning during the infant-toddler stage confuses children, delays their development, and perhaps even results in reduced language competence. In this…

  17. Dual Christoffel Transformations

    NASA Astrophysics Data System (ADS)

    Odake, S.; Sasaki, R.

    2011-07-01

    Crum's theorem and its modification à la Krein-Adler are formulated for the discrete quantum mechanics with real shifts, whose eigenfunctions consist of orthogonal polynomials of a discrete variable. The modification produces the associated polynomials with a finite number of degrees deleted. This in turn provides the well known Christoffel transformation for the dual orthogonal polynomials with the corresponding positions deleted.

  18. High-rate deposition of MgO by reactive ac pulsed magnetron sputtering in the transition mode

    SciTech Connect

    Kupfer, H.; Kleinhempel, R.; Richter, F.; Peters, C.; Krause, U.; Kopte, T.; Cheng, Y.

    2006-01-15

    A reactive ac pulsed dual magnetron sputtering process for MgO thin-film deposition was equipped with a closed-loop control of the oxygen flow rate (F{sub O2}) using the 285 nm magnesium radiation as input. Owing to this control, most of the unstable part of the partial pressure versus flowrate curve became accessible. The process worked steadily and reproducible without arcing. A dynamic deposition rate of up to 35 nm m/min could be achieved, which was higher than in the oxide mode by about a factor of 18. Both process characteristics and film properties were investigated in this work in dependence on the oxygen flow, i.e., in dependence on the particular point within the transition region where the process is operated. The films had very low extinction coefficients (<5x10{sup -5}) and refractive indices close to the bulk value. They were nearly stoichiometric with a slight oxygen surplus (Mg/O=48/52) which was independent of the oxygen flow. X-ray diffraction revealed a prevailing (111) orientation. Provided that appropriate rf plasma etching was performed prior to deposition, no other than the (111) peak could be detected. The intensity of this peak increased with increasing F{sub O{sub 2}}, indicating an even more pronounced (111) texture. The ion-induced secondary electron emission coefficient (iSEEC) was distinctly correlated with the markedness of the (111) preferential orientation. Both refractive index and (111) preferred orientation (which determines the iSEEC) were found to be improved in comparison with the MgO growth in the fully oxide mode. Consequently, working in the transition mode is superior to the oxide mode not only with respect to the growth rate, but also to most important film properties.

  19. Method of magnetron target temperature evaluation by analysis of thermal radiation spectrum

    NASA Astrophysics Data System (ADS)

    Gerasimov, V. A.; Kostrin, D. K.; Selivanov, L. M.; Uhov, A. A.; Komlev, A. E.; Shutova, E. S.

    2016-07-01

    A method of vacuum chamber magnetron target temperature evaluation by measurement of aggregated spectrum of gas discharge emission and target thermal radiation is proposed. Method is based on matching of calculated black body radiation spectrum with given temperature and the minimal points on the measured spectrum.

  20. A cookbook for building a high-current dimpled H– magnetron source for accelerators

    DOE PAGESBeta

    Bollinger, Daniel S.; Karns, Patrick R.; Tan, Cheng -Yang

    2015-10-30

    A high-current (>50 mA) dimpled H– magnetron source has been built at Fermilab for supplying H– beam to the entire accelerator complex. Despite many decades of expertise with slit H– magnetron sources at Fermilab, we were faced with many challenges from the dimpled H– magnetron source, which needed to be overcome in order to make it operational. Dimpled H– sources for high-energy physics are not new: Brookhaven National Laboratory has operated a dimpled H- source for more than two decades. However, the transference of that experience to Fermilab took about two years because a cookbook for building this type ofmore » source did not exist and seemingly innocuous or undocumented choices had a huge impact on the success or failure for this type of source. Moreover, it is the goal of this paper to document the reasons for these choices and to present a cookbook for building and operating dimpled H– magnetron sources.« less

  1. Design of An Inverted Magnetron Gun for a High Power Gyroklystron

    NASA Astrophysics Data System (ADS)

    Read, Michael E.; Nusinovich, Gregory; Ives, R. Lawrence

    2003-12-01

    A magnetron injection gun (MIG) with an inverted geometry is described. Use of an inverted geometry with the inner electrode at ground potential provides support for the inner coax portion of the cavities of a high power gyroklystron, and results in improved optics. The geometry of the gun is described and results of trajectory simulations are presented.

  2. Fabrication of nanogradient coatings for laser devices using the method of magnetron sputtering

    SciTech Connect

    Abramov, N F; Volpyan, O D; Obod, Yu A; Dronskii, R V

    2013-09-30

    Significant advantages of the magnetron sputtering method for producing complex high-quality optical coatings for laser devices are shown. Technology aspects of efficient fabrication of such coatings are considered. The capabilities of the developed automated technological and control equipment are described. (nanogradient dielectric coatings and metamaterials)

  3. Dual double field theory

    NASA Astrophysics Data System (ADS)

    Bergshoeff, Eric A.; Hohm, Olaf; Penas, Victor A.; Riccioni, Fabio

    2016-06-01

    We present the dual formulation of double field theory at the linearized level. This is a classically equivalent theory describing the duals of the dilaton, the Kalb-Ramond field and the graviton in a T-duality or O( D, D) covariant way. In agreement with previous proposals, the resulting theory encodes fields in mixed Young-tableau representations, combining them into an antisymmetric 4-tensor under O( D, D). In contrast to previous proposals, the theory also requires an antisymmetric 2-tensor and a singlet, which are not all pure gauge. The need for these additional fields is analogous to a similar phenomenon for "exotic" dualizations, and we clarify this by comparing with the dualizations of the component fields. We close with some speculative remarks on the significance of these observations for the full non-linear theory yet to be constructed.

  4. Numerical studies and optimization of magnetron with diffraction output (MDO) using particle-in-cell simulations

    NASA Astrophysics Data System (ADS)

    Majzoobi, Alireza

    The first magnetron as a vacuum-tube device, capable of generating microwaves, was invented in 1913. This thesis research focuses on numerical simulation-based analysis of magnetron performance. The particle-in-cell (PIC) based MAGIC software tool has been utilized to study the A6 and the Rising-Sun magnetron structures, and to obtain the optimized geometry for optimizing the device performance. The A6 magnetron is the more traditional structure and has been studied more often. The Rising-Sun geometry, consists of two alternating groups of short and long vanes in angular orientation, and was created to achieve mode stability. The effect of endcaps, changes in lengths of the cathode, the location of cathodes with respect to the anode block, and use of transparent cathodes have been probed to gauge the performance of the A6 magnetron with diffraction output. The simulations have been carried out with different types of endcaps. The results of this thesis research demonstrate peak output power in excess of 1GW, with efficiencies on the order of 66% for magnetic (B)-fields in the range of 0.4T - 0.42T. In addition, particle-in-cell simulations have been performed to provide a numerical evaluation of the efficiency, output power and leakage currents for a 12-cavitiy, Rising-Sun magnetron with diffraction output with transparent cathodes. The results demonstrate peak output power in excess of 2GW, with efficiencies on the order of 68% for B-fields in the 0.42T - 0.46T range. While slightly better performance for longer cathode length has been recorded. The results show the efficiency in excess of 70% and peak output power on the order of 2.1GW for an 18 cm cathode length at 0.45T magnetic field and 400 kV applied voltage. All results of this thesis conform to the definite advantage of having endcaps. Furthermore, the role of secondary electron emission (SEE) on the output performance of the12-cavity, 12-cathodes Rising-Sun magnetron has been probed. The results indicate

  5. Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD).

    PubMed

    Böke, Frederik; Giner, Ignacio; Keller, Adrian; Grundmeier, Guido; Fischer, Horst

    2016-07-20

    Densely sintered aluminum oxide (α-Al2O3) is chemically and biologically inert. To improve the interaction with biomolecules and cells, its surface has to be modified prior to use in biomedical applications. In this study, we compared two deposition techniques for adhesion promoting SiOx films to facilitate the coupling of stable organosilane monolayers on monolithic α-alumina; physical vapor deposition (PVD) by thermal evaporation and plasma enhanced chemical vapor deposition (PE-CVD). We also investigated the influence of etching on the formation of silanol surface groups using hydrogen peroxide and sulfuric acid solutions. The film characteristics, that is, surface morphology and surface chemistry, as well as the film stability and its adhesion properties under accelerated aging conditions were characterized by means of X-ray photoelectron spectroscopy (XPS), energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy (SEM), inductively coupled plasma-optical emission spectroscopy (ICP-OES), and tensile strength tests. Differences in surface functionalization were investigated via two model organosilanes as well as the cell-cytotoxicity and viability on murine fibroblasts and human mesenchymal stromal cells (hMSC). We found that both SiOx interfaces did not affect the cell viability of both cell types. No significant differences between both films with regard to their interfacial tensile strength were detected, although failure mode analyses revealed a higher interfacial stability of the PE-CVD films compared to the PVD films. Twenty-eight day exposure to simulated body fluid (SBF) at 37 °C revealed a partial delamination of the thermally deposited PVD films whereas the PE-CVD films stayed largely intact. SiOx layers deposited by both PVD and PE-CVD may thus serve as viable adhesion-promoters for subsequent organosilane coupling agent binding to α-alumina. However, PE-CVD appears to be favorable for long-term direct film exposure to aqueous

  6. Dual-Schemata Model

    NASA Astrophysics Data System (ADS)

    Taniguchi, Tadahiro; Sawaragi, Tetsuo

    In this paper, a new machine-learning method, called Dual-Schemata model, is presented. Dual-Schemata model is a kind of self-organizational machine learning methods for an autonomous robot interacting with an unknown dynamical environment. This is based on Piaget's Schema model, that is a classical psychological model to explain memory and cognitive development of human beings. Our Dual-Schemata model is developed as a computational model of Piaget's Schema model, especially focusing on sensori-motor developing period. This developmental process is characterized by a couple of two mutually-interacting dynamics; one is a dynamics formed by assimilation and accommodation, and the other dynamics is formed by equilibration and differentiation. By these dynamics schema system enables an agent to act well in a real world. This schema's differentiation process corresponds to a symbol formation process occurring within an autonomous agent when it interacts with an unknown, dynamically changing environment. Experiment results obtained from an autonomous facial robot in which our model is embedded are presented; an autonomous facial robot becomes able to chase a ball moving in various ways without any rewards nor teaching signals from outside. Moreover, emergence of concepts on the target movements within a robot is shown and discussed in terms of fuzzy logics on set-subset inclusive relationships.

  7. Self-dual electromagnetic fields

    NASA Astrophysics Data System (ADS)

    Chubykalo, Andrew E.; Espinoza, Augusto; Kosyakov, B. P.

    2010-08-01

    We demonstrate the utility of self-dual fields in electrodynamics. Stable configurations of free electromagnetic fields can be represented as superpositions of standing waves, each possessing zero Poynting vector and zero orbital angular momentum. The standing waves are themselves superpositions of self-dual and anti-self-dual solutions. The idea of self-duality provides additional insights into the geometrical and spectral properties of stable electromagnetic configurations, such as those responsible for the formation of ball lightning.

  8. ECR plasma-assisted PVD deposition of α-Fe thin film on melt-spun Nd-Fe-B alloys

    NASA Astrophysics Data System (ADS)

    Fedorchenko, V. D.; Bovda, A. M.; Bovda, V. A.; Chen, C. H.; Chebotarev, V. V.; Garkusha, I. E.; Liu, S.; Medvedev, A. V.; Tereshin, V. I.

    2008-03-01

    The paper deals with plasma-assisted PVD of α-Fe thin film onto the melt-spun Nd-Fe-B-Co ribbons. The parameters of the plasma created by a planar rectangular ECR plasma source with a multipolar magnetic field and a double-slot antenna were as follows: electron density up to 1×1010 cm-3, electron temperature ˜22 eV, the current density of ion flow to grounded disk-substrate was equal to ˜0.5 mA/cm2 at the gas flow of 1 sccm, the microwave power was up to 300W. After degreasing and ultrasonic washing of Nd-Fe-B-Co ribbons, follow by ion etching, the deposition process was realized at a pulsed voltage bias of -1000 V with frequency 100 Hz, total current on the target 240 mA, current density 2.9 mA/cm2. The deposition rate of 0.0083 μm/min was achieved. The process continued for 2 hour. It was found that the magnetic melt-spun ribbons were homogeneously coated with the α-Fe film having a typical thickness of 1 μm.

  9. Effect of La2O3 addition on interface chemistry between 4YSZ top layer and Ni based alloy bond coat in thermal barrier coating by EB PVD.

    PubMed

    Park, Chan-Young; Yang, Young-Hwan; Kim, Seong-Won; Lee, Sung-Min; Kim, Hyung-Tae; Jang, Byung-Koog; Lim, Dae-Soon; Oh, Yoon-Suk

    2014-11-01

    The effect of a 5 mol% La2O3 addition on the forming behavior and compositional variation at interface between a 4 mol% Yttria (Y2O3) stabilized ZrO2 (4YSZ) top coat and bond coat (NiCrAlY) as a thermal barrier coating (TBC) has been investigated. Top coats were deposited by electron beam physical vapor deposition (EB PVD) onto a super alloy (Ni-Cr-Co-Al) substrate without pre-oxidation of the bond coat. Top coats are found to consist of dense columnar grains with a thin interdiffusion layer between metallic bond coats. In the as-received 4YSZ coating, a thin interdiffusion zone at the interface between the top and bond coats was found to consist of a Ni-Zr intermetallic compound with a reduced quantity of Y, Al or O elements. On the other hand, in the case of an interdiffusion area of 5 mol% La2O3-added 4YSZ coating, it was found that the complicated composition and structure with La-added YSZ and Ni-Al rich compounds separately. The thermal conductivity of 5 mol% La2O3-added 4YSZ coating (- 1.6 W/m x k at 1100 degrees C) was lower than a 4YSZ coating (- 3.2 W/m x k at 1100 degrees C) alone. PMID:25958580

  10. Effect of a ductility layer on the tensile strength of TiAl-based multilayer composite sheets prepared by EB-PVD

    SciTech Connect

    Zhang, Rubing; Zhang, Yaoyao; Liu, Qiang; Chen, Guiqing; Zhang, Deming

    2014-09-15

    TiAl/Nb and TiAl/NiCoCrAl laminate composite sheets with a thickness of 0.4–0.6 mm and dimensions of 150 mm × 100 mm were successfully fabricated by electron beam physical vapor deposition. The microstructures of the sheets were examined, and their mechanical properties were compared with those of TiAl monolithic sheet produced by electron beam physical vapor deposition. Tensile testing was performed at room temperature and 750 °C, and the fracture surfaces were examined by scanning electron microscopy. Among the three microlaminate sheets, the TiAl/NiCoCrAl micro-laminate sheet had the best comprehensive properties at room temperature, and the TiAl/Nb micro-laminate sheet showed the ideal high-temperature strength and plasticity at 750 °C. The result was discussed in terms of metal strengthening mechanism. - Highlights: • TiAl-based multilayer foils was fabricated successfully by using EB-PVD method; • The tensile properties and micro-fracture morphologies of the sheet were investigated; • The deformation behavior of the multilayer foils was discussed.

  11. Abdominal Dual Energy Imaging

    NASA Astrophysics Data System (ADS)

    Sommer, F. Graham; Brody, William R.; Cassel, Douglas M.; Macovski, Albert

    1981-11-01

    Dual energy scanned projection radiography of the abdomen has been performed using an experimental line-scanned radiographic system. Digital images simultaneously obtained at 85 and 135 kVp are combined, using photoelectric/Compton decomposition algorithms to create images from which selected materials are cancelled. Soft tissue cancellation images have proved most useful in various abdominal imaging applications, largely due to the elimination of obscuring high-contrast bowel gas shadows. These techniques have been successfully applied to intravenous pyelography, oral cholecystography, intravenous abdominal arteriog-raphy and the imaging of renal calculi.

  12. Dual stage check valve

    NASA Technical Reports Server (NTRS)

    Whitten, D. E. (Inventor)

    1973-01-01

    A dual stage seat valve head arrangement is described which consists of a primary sealing point located between a fixed orifice seat and a valve poppet, and a secondary sealing point between an orifice poppet and a valve poppet. Upstream of the valve orifice is a flexible, convoluted metal diaphragm attached to the orifice poppet. Downstream of the valve orifice, a finger spring exerts a force against the valve poppet, tending to keep the valve in a closed position. The series arrangement of a double seat and poppet is able to tolerate small particle contamination while minimizing chatter by controlling throttling or metering across the secondary seat, thus preserving the primary sealing surface.

  13. Dual solvent refining process

    SciTech Connect

    Woodle, R.A.

    1982-04-20

    A dual solvent refining process is claimed for solvent refining petroleum based lubricating oil stocks with n-methyl-2-pyrrolidone as selective solvent for aromatic oils wherein a highly paraffinic oil having a narrow boiling range approximating the boiling point of n-methyl-2-pyrrolidone is employed as a backwash solvent. The process of the invention results in an increased yield of refined lubricating oil stock of a predetermined quality and simplifies separation of the solvents from the extract and raffinate oil fractions.

  14. Dual modification of biomolecules.

    PubMed

    Maruani, Antoine; Richards, Daniel A; Chudasama, Vijay

    2016-07-14

    With the advent of novel bioorthogonal reactions and "click" chemistry, an increasing number of strategies for the single labelling of proteins and oligonucleotides have emerged. Whilst several methods exist for the site-selective introduction of a single chemical moiety, site-selective and bioorthogonal dual modification of biomolecules remains a challenge. The introduction of multiple modules enables a plethora of permutations and combinations and can generate a variety of bioconjuguates with many potential applications. From de novo approaches on oligomers to the post-translational functionalisation of proteins, this review will highlight the main strategies to dually modify biomolecules. PMID:27278999

  15. Characterization of high power impulse magnetron sputtering discharges

    NASA Astrophysics Data System (ADS)

    Hala, Matej

    Paper I: In the first paper, we present a new approach in the characterization of the high power pulsed magnetron sputtering (HiPIMS) discharge evolution—time- and species-resolved plasma imaging—employing a set of band-pass optical interference filters suitable for the isolation of the emission originating from different species populating the plasma. We demonstrate that the introduction of such filters can be used to distinguish different phases of the discharge, and to visualize numerous plasma effects including background gas excitations during the discharge ignition, gas shock waves, and expansion of metal-rich plasmas. In particular, the application of this technique is shown on the diagnostics of the 200 µs long non-reactive HiPIMS discharges using a Cr target. Paper II: In order to gain further information about the dynamics of reactive HiPIMS discharges, both fast plasma imaging and time- and space-resolved optical emission spectroscopy (OES) are used for a systematic investigation of the 200 µs long HiPIMS pulses operated in Ar, N2 and N 2/Ar mixtures and at various pressures. It is observed that the dense metal plasma created next to the target propagates in the reactor at a speed ranging from 0.7 to 3.5 km s-1, depending on the working gas composition and the pressure. In fact, it increases with higher N 2 concentration and with lower pressure. The visible form of the propagating plasma wave changes from a hemispherical shape in Ar to a drop-like shape extending far from the target with increasing N2 concentration, owing to the significant emission from molecular N2. Interestingly, the evidence of the target self-sputtering is found for all investigated conditions, including pure N2 atmosphere. Paper III: Here, we report on the time- and species-resolved plasma imaging analysis of the dynamics of the 200 µs long HiPIMS discharges above a Cr target ignited in pure O2. It is shown that the discharge emission is dominated solely by neutral and

  16. Freudenthal dual Lagrangians

    NASA Astrophysics Data System (ADS)

    Borsten, L.; Duff, M. J.; Ferrara, S.; Marrani, A.

    2013-12-01

    The global U-dualities of extended supergravity have played a central role in differentiating the distinct classes of extremal black hole solutions. When the U-duality group satisfies certain algebraic conditions, as is the case for a broad class of supergravities, the extremal black holes enjoy a further symmetry known as Freudenthal duality (F-duality), which although distinct from U-duality preserves the Bekenstein-Hawking entropy. Here it is shown that, by adopting the doubled Lagrangian formalism, F-duality, defined on the doubled field strengths, is not only a symmetry of the black hole solutions, but also of the equations of motion themselves. A further role for F-duality is introduced in the context of world-sheet actions. The Nambu-Goto world-sheet action in any (t, s) signature spacetime can be written in terms of the F-dual. The corresponding field equations and Bianchi identities are then related by F-duality allowing for an F-dual formulation of Gaillard-Zumino duality on the world-sheet. An equivalent polynomial ‘Polyakov-type’ action is introduced using the so-called black hole potential. Such a construction allows for actions invariant under all groups of type E7, including E7 itself, although in this case the stringy interpretation is less clear.

  17. Dual-CARS microscopy

    NASA Astrophysics Data System (ADS)

    Enejder, Annika; Brackmann, Christian; Burkacky, Ondrej; Åkeson, Madeleine

    2007-02-01

    We present a new Coherent Anti-Stokes Raman Scattering (CARS) microscopy technique for label-free imaging of biomolecules in living cells; dual-CARS microscopy. The use of three synchronized laser pulses in a dual-pump/dualdetection configuration enables imaging of two species with different molecular vibrations simultaneously, as well as acquisition of images free of non-resonant background. We show the power of the method by imaging deuterated nonadecane slowly diffusing into a suspension of living yeast cells in medium, clearly distinguishing the medium and the lipid droplets in the cells by probing the CH II vibration from the D-nonadecane by probing the CD vibration. In addition, images of lipid stores in living C. elegans nematodes free of non-resonant background are shown. This results in a significant enhancement of the image contrast, allowing the visualization of emerging, low-density lipid stores in a dauer larva, difficult to distinguish in conventional CARS microscopy. The separation of the non-resonant background is shown to be beneficial also when monitoring molecules with weak vibrational modes. The improved sensitivity obtained is illustrated by probing the C=C vibration in polyunsaturated lipids extracted from fish. This enables the monitoring of the degree of unsaturation of lipids, a high value of which is reported in foods known to have positive effects on human health.

  18. Simulation of Secondary Electron and Backscattered Electron Emission in A6 Relativistic Magnetron Driven by Different Cathode

    NASA Astrophysics Data System (ADS)

    Liu, Meiqin; Li, Bolun; Liu, Chunliang; Fuks, Mikhail; Edl, Schamiloglu

    2015-01-01

    Prticle-in-cell (PIC) simulations demonstrated that, when the relativistic magnetron with diffraction output (MDO) is applied with a 410 kV voltage pulse, or when the relativistic magnetron with radial output is applied with a 350 kV voltage pulse, electrons emitted from the cathode with high energy will strike the anode block wall. The emitted secondary electrons and backscattered electrons affect the interaction between electrons and RF fields induced by the operating modes, which decreases the output power in the radial output relativistic magnetron by about 15% (10% for the axial output relativistic magnetron), decreases the anode current by about 5% (5% for the axial output relativistic magnetron), and leads to a decrease of electronic efficiency by 8% (6% for the axial output relativistic magnetron). The peak value of the current formed by secondary and backscattered current equals nearly half of the amplitude of the anode current, which may help the growth of parasitic modes when the applied magnetic field is near the critical magnetic field separating neighboring modes. Thus, mode competition becomes more serious.

  19. Dual-Credit in Kentucky

    ERIC Educational Resources Information Center

    Stephenson, Lisa G.

    2013-01-01

    Credit-based transition programs provide high school students with opportunities to jump start their college education. The Kentucky Community and Technical College System (KCTCS) offers college credit through dual-credit programs. While KCTCS dual-credit offerings have been successful in helping high school students start their college education…

  20. Microstructural evaluation of NiTi-based films deposited by magnetron sputtering

    SciTech Connect

    Crăciunescu, Corneliu M. Mitelea, Ion Budău, Victor; Ercuţa, Aurel

    2014-11-24

    Shape memory alloy films belonging to the NiTi-based systems were deposited on heated and unheated substrates, by magnetron sputtering in a custom made system, and their structure and composition was analyzed using electron microscopy. Several substrates were used for the depositions: glass, Cu-Zn-Al, Cu-Al-Ni and Ti-NiCu shape memory alloy ribbons and kapton. The composition of the Ti-Ni-Cu films showed limited differences, compared to the one of the target and the microstructure for the DC magnetron sputtering revealed crystallized structure with features determined on peel off samples from a Si wafer. Both inter and transcrystalline fractures were observed and related to the interfacial stress developed on cooling from deposition temperature.

  1. Equibrium and Stability of the Brillouin Flow in Recirculating Planar Magnetron

    NASA Astrophysics Data System (ADS)

    Simon, D. H.; Lau, Y. Y.; Franzi, M.; Greening, G.; Gilgenbach, R. M.; Luginsland, J. W.

    2011-10-01

    Simulation of the novel recirculating planar magnetron, RPM, has shown rapid formation of electron bunches in the inverted magnetron configuration. This bunching mechanism was recently simulated in a thin electron layer model, which exhibited negative, positive, and infinite mass behavior, depending on the magnitude and sign of the radial electric field. We analyze these properties for the relativistic, cylindrical Brillouin flow, to evaluate RPM startup. We make use of our recent discovery that the electrostatic potential and the vector potential satisfy a Buneman-Hartree like relation, and a Hull-cutoff like relation EVERYWHERE within the equilibrium Brillouin flow. This work was supported by AFOSR, L-3 Communications Electron Devices, and Northrop Grumman Corporation.

  2. Resistive switching behavior of RF magnetron sputtered ZnO thin films

    NASA Astrophysics Data System (ADS)

    Rajalakshmi, R.; Angappane, S.

    2015-06-01

    The resistive switching characteristics of RF magnetron sputtered zinc oxide thin films have been studied. The x-ray diffraction studies confirm the formation of crystalline ZnO on Pt/TiO2/SiOx/Si substrate. We have fabricated Cu/ZnO/Pt device using a shadow masking technique for resistive switching study. Our Cu/ZnO/Pt device exhibits a unipolar resistive switching behaviour. The switching observed in our device could be related to oxygen vacancies or Cu ions that generate the conducting filaments responsible for resistive switching. We found HRS to LRS resistance ratio of as high as ˜200 for our Cu/ZnO/Pt device. The higher resistance ratio and stability of Cu/ZnO/Pt device would make our RF magnetron sputtered zinc oxide thin films suitable for non volatile memory applications.

  3. Analytic model of the energy distribution function for highly energetic electrons in magnetron plasmas

    SciTech Connect

    Gallian, Sara Trieschmann, Jan; Mussenbrock, Thomas; Brinkmann, Ralf Peter; Hitchon, William N. G.

    2015-01-14

    This paper analyzes a situation which is common for magnetized technical plasmas such as dc magnetron discharges and high power impulse magnetron sputtering (HiPIMS) systems, where secondary electrons enter the plasma after being accelerated in the cathode fall and encounter a nearly uniform bulk. An analytic calculation of the distribution function of hot electrons is presented; these are described as an initially monoenergetic beam that slows down by Coulomb collisions with a Maxwellian distribution of bulk (cold) electrons, and by inelastic collisions with neutrals. Although this analytical solution is based on a steady-state assumption, a comparison of the characteristic time-scales suggests that it may be applicable to a variety of practical time-dependent discharges, and it may be used to introduce kinetic effects into models based on the hypothesis of Maxwellian electrons. The results are verified for parameters appropriate to HiPIMS discharges, by means of time-dependent and fully kinetic numerical calculations.

  4. Magnetron sputtered boron films for increasing hardness of a metal surface

    DOEpatents

    Makowiecki, Daniel M.; Jankowski, Alan F.

    2003-05-27

    A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.

  5. Formation of low-frequency periodic structures in a pulsed magnetron discharge

    NASA Astrophysics Data System (ADS)

    Kaziev, A. V.; Khodachenko, G. V.; Kharkov, M. M.

    2016-01-01

    Periodic plasma structures are observed in non-sputtering magnetron discharge (NSMD) that is the transient quasi-stationary low-voltage regime between the high-current magnetron discharge (HCIMD) and an arc. The fast camera imaging synchronized with the magnetic probe diagnostics reveals the correlation between the observed rotation of the plasma inhomogeneities and the magnetic field perturbation behaviour. The frequencies of the periodic processes fall into kHz-range. A simple analytical model of the ionization instability in crossed electric and magnetic fields is suggested for the low-pressure discharge case. Using the model, the possible ranges of wavelengths and frequencies for the plasma inhomogeneities are evaluated. The results show good agreement between the experimental data and theory.

  6. Microstructural evaluation of NiTi-based films deposited by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Crǎciunescu, Corneliu M.; Mitelea, Ion; Budǎu, Victor; ErcuÅ£a, Aurel

    2014-11-01

    Shape memory alloy films belonging to the NiTi-based systems were deposited on heated and unheated substrates, by magnetron sputtering in a custom made system, and their structure and composition was analyzed using electron microscopy. Several substrates were used for the depositions: glass, Cu-Zn-Al, Cu-Al-Ni and Ti-NiCu shape memory alloy ribbons and kapton. The composition of the Ti-Ni-Cu films showed limited differences, compared to the one of the target and the microstructure for the DC magnetron sputtering revealed crystallized structure with features determined on peel off samples from a Si wafer. Both inter and transcrystalline fractures were observed and related to the interfacial stress developed on cooling from deposition temperature.

  7. High power pulsed magnetron sputtering: A method to increase deposition rate

    SciTech Connect

    Raman, Priya McLain, Jake; Ruzic, David N; Shchelkanov, Ivan A.

    2015-05-15

    High power pulsed magnetron sputtering (HPPMS) is a state-of-the-art physical vapor deposition technique with several industrial applications. One of the main disadvantages of this process is its low deposition rate. In this work, the authors report a new magnetic field configuration, which produces deposition rates twice that of conventional magnetron's dipole magnetic field configuration. Three different magnet pack configurations are discussed in this paper, and an optimized magnet pack configuration for HPPMS that leads to a higher deposition rate and nearly full-face target erosion is presented. The discussed magnetic field produced by a specially designed magnet assembly is of the same size as the conventional magnet assembly and requires no external fields. Comparison of deposition rates with different power supplies and the electron trapping efficiency in complex magnetic field arrangements are discussed.

  8. Resistive switching behavior of RF magnetron sputtered ZnO thin films

    SciTech Connect

    Rajalakshmi, R.; Angappane, S.

    2015-06-24

    The resistive switching characteristics of RF magnetron sputtered zinc oxide thin films have been studied. The x-ray diffraction studies confirm the formation of crystalline ZnO on Pt/TiO{sub 2}/SiO{sub x}/Si substrate. We have fabricated Cu/ZnO/Pt device using a shadow masking technique for resistive switching study. Our Cu/ZnO/Pt device exhibits a unipolar resistive switching behaviour. The switching observed in our device could be related to oxygen vacancies or Cu ions that generate the conducting filaments responsible for resistive switching. We found HRS to LRS resistance ratio of as high as ∼200 for our Cu/ZnO/Pt device. The higher resistance ratio and stability of Cu/ZnO/Pt device would make our RF magnetron sputtered zinc oxide thin films suitable for non volatile memory applications.

  9. Particle-In-Cell (PIC) simulation of long-anode magnetron

    NASA Astrophysics Data System (ADS)

    Verma, Rajendra Kumar; Maurya, Shivendra; Singh, Vindhyavasini Prasad

    2016-03-01

    Long Anode Magnetron (LAM) is a design scheme adopted to attain greater thermal stability and higher power levels for the conventional magnetrons. So a LAM for 5MW Power level at 2.858 GHz was `Virtual Prototyped' using Admittance Matching field theory (AMT) andthen a PIC Study (Beam-wave interaction) was conducted using CST Particle Studio (CST-PS) which is explained in this paper. The convincing results thus obtained were - hot resonant frequency of 2.834 GHz. Output power of 5 MW at beam voltage of 58kV and applied magnetic field of 2200 Gauss with an overall efficiency of 45%. The simulated parameters values on comparison with the E2V LAM tube (M5028) were in good agreement which validates the feasibility of the design approach.

  10. Power-combining based on master–slave injection-locking magnetron

    NASA Astrophysics Data System (ADS)

    Ping, Yuan; Yi, Zhang; Wenjun, Ye; Huacheng, Zhu; Kama, Huang; Yang, Yang

    2016-07-01

    A microwave power-combining system composed of two Panasonic 2M244-M1 magnetrons based on master–slave injection-locking is demonstrated in this paper. The principle of master–slave injection-locking and the locking condition are theoretical analyzed. Experimental results are consistent with the theoretical analysis and the experimental combined efficiency is higher than 96%. Compared with the external-injection-locked system, the power-combining based on the master–slave injection-locking magnetron is superior by taking out the external solid-state driver and the real-time phase control system. Thus, this power-combining system has great potential for obtaining a high efficiency, high stability, low cost, and high power microwave source. Project supported by the National Basic Research Program of China (Grant No. 2013CB328902) and the National Natural Science Foundation of China (Grant No. 61501311).

  11. Facility for combined in situ magnetron sputtering and soft x-ray magnetic circular dichroism

    SciTech Connect

    Telling, N. D.; Laan, G. van der; Georgieva, M. T.; Farley, N. R. S.

    2006-07-15

    An ultrahigh vacuum chamber that enables the in situ growth of thin films and multilayers by magnetron sputtering techniques is described. Following film preparation, x-ray absorption spectroscopy (XAS) and x-ray magnetic circular dichroism (XMCD) measurements are performed by utilizing an in vacuum electromagnet. XMCD measurements on sputtered thin films of Fe and Co yield spin and orbital moments that are consistent with those obtained previously on films measured in transmission geometry and grown in situ by evaporation methods. Thin films of FeN prepared by reactive sputtering are also examined and reveal an apparent enhancement in the orbital moment for low N content samples. The advantages of producing samples for in situ XAS and XMCD studies by magnetron sputtering are discussed.

  12. Are the argon metastables important in high power impulse magnetron sputtering discharges?

    SciTech Connect

    Gudmundsson, J. T.; Lundin, D.; Minea, T. M.; Stancu, G. D.; Brenning, N.

    2015-11-15

    We use an ionization region model to explore the ionization processes in the high power impulse magnetron sputtering (HiPIMS) discharge in argon with a titanium target. In conventional dc magnetron sputtering (dcMS), stepwise ionization can be an important route for ionization of the argon gas. However, in the HiPIMS discharge stepwise ionization is found to be negligible during the breakdown phase of the HiPIMS pulse and becomes significant (but never dominating) only later in the pulse. For the sputtered species, Penning ionization can be a significant ionization mechanism in the dcMS discharges, while in the HiPIMS discharge Penning ionization is always negligible as compared to electron impact ionization. The main reasons for these differences are a higher plasma density in the HiPIMS discharge, and a higher electron temperature. Furthermore, we explore the ionization fraction and the ionized flux fraction of the sputtered vapor and compare with recent experimental work.

  13. Measuring the energy flux at the substrate position during magnetron sputter deposition processes

    SciTech Connect

    Cormier, P.-A.; Thomann, A.-L.; Dussart, R.; Semmar, N.; Mathias, J.; Balhamri, A.; Snyders, R.; Konstantinidis, S.

    2013-01-07

    In this work, the energetic conditions at the substrate were investigated in dc magnetron sputtering (DCMS), pulsed dc magnetron sputtering (pDCMS), and high power impulse magnetron sputtering (HiPIMS) discharges by means of an energy flux diagnostic based on a thermopile sensor, the probe being set at the substrate position. Measurements were performed in front of a titanium target for a highly unbalanced magnetic field configuration. The average power was always kept to 400 W and the probe was at the floating potential. Variation of the energy flux against the pulse peak power in HiPIMS was first investigated. It was demonstrated that the energy per deposited titanium atom is the highest for short pulses (5 {mu}s) high pulse peak power (39 kW), as in this case, the ion production is efficient and the deposition rate is reduced by self-sputtering. As the argon pressure is increased, the energy deposition is reduced as the probability of scattering in the gas phase is increased. In the case of the HiPIMS discharge run at moderate peak power density (10 kW), the energy per deposited atom was found to be lower than the one measured for DCMS and pDCMS discharges. In these conditions, the HiPIMS discharge could be characterized as soft and close to a pulsed DCMS discharge run at very low duty cycle. For the sake of comparison, measurements were also carried out in DCMS mode with a balanced magnetron cathode, in the same working conditions of pressure and power. The energy flux at the substrate is significantly increased as the discharge is generated in an unbalanced field.

  14. Non-uniform plasma distribution in dc magnetron sputtering: origin, shape and structuring of spokes

    NASA Astrophysics Data System (ADS)

    Panjan, Matjaž; Loquai, Simon; Ewa Klemberg-Sapieha, Jolanta; Martinu, Ludvik

    2015-12-01

    Non-homogeneous plasma distribution in the form of organized patterns called spokes was first observed in high power impulse magnetron sputtering (HiPIMS). In the present work we investigate the spoke phenomenon in non-pulsed low-current dc magnetron sputtering (DCMS). Using a high-speed camera the spokes were systematically studied with respect to discharge current, pressure, target material and magnetic field strength. Increase in the discharge current and/or gas pressure resulted in the sequential formation of two, then three and more spokes. The observed patterns were reproducible for the same discharge conditions. Spokes at low currents and pressures formed an elongated arrowhead-like shape and were commonly arranged in symmetrical patterns. Similar spoke patterns were observed for different target materials. When using a magnetron with a weaker magnetic field, spokes had an indistinct and diffuse shape, whereas in stronger magnetic fields spokes exhibited an arrowhead-like shape. The properties of spokes are discussed in relation to the azimuthally dependent electron-argon interactions. It is suggested that a single spoke is formed due to local gas breakdown and subsequent electron drift in the azimuthal direction. The spoke is self-sustained by electrons drifting in complex electric and magnetic fields that cause and govern azimuthally dependent processes: ionization, sputtering, and secondary electron emission. In this view plasma evolves from a single spoke into different patterns when discharge conditions are changed either by the discharge current, pressure or magnetic field strength. The azimuthal length of the spoke is associated with the electron-Ar collision frequency which increases with pressure and results in shortening of spoke until an additional spoke forms at a particular threshold pressure. It is proposed that the formation of additional spokes at higher pressures and discharge currents is, in part, related to the increased transport of

  15. Electrochromism of DC magnetron-sputtered TiO2: Role of film thickness

    NASA Astrophysics Data System (ADS)

    Sorar, Idris; Pehlivan, Esat; Niklasson, Gunnar A.; Granqvist, Claes G.

    2014-11-01

    Titanium dioxide films were prepared by reactive DC magnetron sputtering and the role of the film thickness d on the electrochromism was analyzed for 100 < d < 400 nm. The best properties were obtained for the thickest films, which yielded a mid-luminous transmittance modulation of 58% and a corresponding coloration efficiency of 26.3 cm2/C. The films were amorphous according to X-ray diffraction measurements and showed traces of adsorbed water as revealed by infrared spectroscopy.

  16. Design comparison of single-anode and double-anode 300-MW magnetron injection gun

    SciTech Connect

    Lawson, W.; Specht, V. )

    1993-07-01

    Analytic tradeoff equations based on adiabatic assumptions are used to explore feasible design regions for single-anode Magnetron Injection Guns (MIG's). Particle simulations are then used to optimize a single-anode and a double-anode design for a 1-[mu]s, 500-kV, 600-A MIG which is required for a second-harmonic gyroklystron. The advantages and disadvantages of each configuration are critically examined.

  17. Effects of Substrate Temperature on ZAO Thin Film Prepared by DC Magnetron Reactive Sputtering

    NASA Astrophysics Data System (ADS)

    Lu, F.; Zhou, X. G.; Xu, C. H.; Wen, L. S.

    The effects of substrate temperature on the resistivity and transmittance of ZAO thin films prepared by DC magnetron reactive sputtering have been investigated. The properties of the samples have been analyzed through Hall effect, X-ray diffraction and SEM. The results show that carrier concentration, Hall mobility and crystallinity of the films depend obviously on the deposition temperature. The film deposited at the range 200-250°C has lower resistivity and higher transmittance.

  18. MeV electron irradiation of Si-SiO2 structures with magnetron sputtered oxide

    NASA Astrophysics Data System (ADS)

    Kaschieva, S.; Angelov, Ch; Dmitriev, S. N.

    2016-03-01

    MeV electrons influence on the characteristics of Si-SiO2 structure with magnetron sputtered oxide was studied by ellipsometry and the thermally stimulated current (TSC) method. The MOS structures used in this study were fabricated on <100> oriented p-Si wafers of 12.75-17,25 Ω.cm resistivity. Magnetron sputtered oxides with different thicknesses of 20 and 100 nm were deposited on p-Si substrates. Both groups of samples were irradiated by 23 MeV electrons. The oxide thicknesses and TSC characteristics of the MOS samples were measured before and after MeV electron irradiation with doses of 4.8×1015 and 4.8×1016 el.cm-2. The oxide thicknesses of both groups of samples increased after irradiation. The main defects generated by the MeV electrons were evaluated. It was shown that the trap concentration increases with the electron irradiation dose. The main peak in the TSC characteristics gives information about the main radiation defects at the Si-SiO2 interface of the MOS structures. These defects can be related to the vacancy-boron complexes which are associated with the main impurities in the p-Si substrate. These results correspond to our results reported earlier for MeV electron irradiated Si-SiO2 structures with thermally grown oxide. But (in this case) the effects observed are more pronounced for the magnetron sputtered oxide. A possible reason is the higher defect concentration generated in the magnetron sputtered oxide during its deposition on Si-substrates.

  19. Experimental investigation of quasiperiodic-chaotic-quasiperiodic-chaotic transition in a direct current magnetron sputtering plasma

    SciTech Connect

    Sabavath, Gopi Kishan; Banerjee, I.; Mahapatra, S. K.; Shaw, Pankaj Kumar; Sekar Iyengar, A. N.

    2015-08-15

    Floating potential fluctuations from a direct current magnetron sputtering plasma have been analysed using time series analysis techniques like phase space plots, power spectra, frequency bifurcation plot, etc. The system exhibits quasiperiodic-chaotic-quasiperiodic-chaotic transitions as the discharge voltage was increased. The transitions of the fluctuations, quantified using the largest Lyapunov exponent, have been corroborated by Hurst exponent and the Shannon entropy. The Shannon entropy is high for quasiperiodic and low for chaotic oscillations.

  20. Modelling and Optimization of Technological Process for Magnetron Synthesis of Altin Nanocomposite Films on Cutting Tools

    NASA Astrophysics Data System (ADS)

    Kozhina, T. D.

    2016-04-01

    The paper highlights the results of the research on developing the mechanism to model the technological process for magnetron synthesis of nanocomposite films on cutting tools, which provides their specified physical and mechanical characteristics by controlling pulsed plasma parameters. The paper presents optimal conditions for AlTiN coating deposition on cutting tools according to the ion energy of sputtered atoms in order to provide their specified physical and mechanical characteristics.

  1. Effect of buffer layer on thermochromic performances of VO2 films fabricated by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Zhu, Benqin; Tao, Haizheng; Zhao, Xiujian

    2016-03-01

    As a well-developed industrial fabricating method, magnetron sputtering technique has its distinct advantages for the large-scale production. In order to investigate the effect of buffer layer on the formation and thermochromic performances of VO2 films, using RF magnetron sputtering method, we fabricated three kinds of buffer layers SiO2, TiO2 and SnO2 on soda lime float-glass. Then according to the reactive DC magnetron sputtering method, VO2 films were deposited. Due to the restriction of heat treatment temperature when using soda lime float-glass as substrates, dense rutile phase TiO2 cannot be formed, leading to the formation of vanadium oxide compounds containing Na ions. When using SnO2 as buffer layer, we found that relatively high pure VO2 can be deposited more easily. In addition, compared with the effect of SiO2 buffer layer, we observed an enhanced visible transparency, a decreased infrared emissivity, which should be mainly originated from the modified morphology and/or the hetero-structured VO2/SnO2 interface.

  2. Study on the effect of target on plasma parameters of magnetron sputtering discharge plasma

    SciTech Connect

    Saikia, P.; Kakati, B.; Saikia, B. K.

    2013-10-15

    In this study, the effect of magnetron target on different plasma parameters of Argon/Hydrogen (Ar - H{sub 2}) direct current (DC) magnetron discharge is examined. Here, Copper (Cu) and Chromium (Cr) are used as magnetron targets. The value of plasma parameters such as electron temperature (kT{sub e}), electron density (N{sub e}), ion density (N{sub i}), degree of ionization of Ar, and degree of dissociation of H{sub 2} for both the target are studied as a function of input power and hydrogen content in the discharge. The plasma parameters are determined by using Langmuir probe and Optical emission spectroscopy. On the basis of the different reactions in the gas phase, the variation of plasma parameters and sputtering rate are explained. The obtained results show that electron and ion density decline with gradual addition of Hydrogen in the discharge and increase with rising input power. It brings significant changes on the degree of ionization of Ar and dissociation of H{sub 2}. The enhanced value of electron density (N{sub e}), ion density (N{sub i}), degree of Ionization of Ar, and degree of dissociation of H{sub 2} for Cr compared to Cu target is explained on the basis of it's higher Ion Induced Secondary Electron Emission Coefficient (ISEE) value.

  3. S-band relativistic magnetron operation with an active plasma cathode

    NASA Astrophysics Data System (ADS)

    Hadas, Y.; Sayapin, A.; Kweller, T.; Krasik, Ya. E.

    2009-04-01

    Results of experimental research on a relativistic S-band magnetron with a ferroelectric plasma source as a cathode are presented. The cathode plasma was generated using a driving pulse (˜3 kV, 200 ns) applied to the ferroelectric cathode electrodes via inductive decoupling prior to the beginning of an accelerating pulse (200 kV, 150 ns) delivered by a linear induction accelerator. The magnetron and generated microwave radiation parameters obtained for the ferroelectric plasma cathode and the explosive emission plasma were compared. It was shown that the application of the ferroelectric plasma cathode allows one to avoid a time delay in the appearance of the electron emission to achieve a better matching between the magnetron and linear induction accelerator impedances and to increase significantly (˜30%) the duration of the microwave pulse with an ˜10% increase in the microwave power. The latter results in the microwave radiation generation being 30% more efficient than when the explosive emission cathode is used, where efficiency does not exceed 20%.

  4. Plasma"anti-assistance" and"self-assistance" to high power impulse magnetron sputtering

    SciTech Connect

    Anders, Andre; Yushkov, Georgy Yu.

    2009-01-30

    A plasma assistance system was investigated with the goal to operate high power impulse magnetron sputtering (HiPIMS) at lower pressure than usual, thereby to enhance the utilization of the ballistic atoms and ions with high kinetic energy in the film growth process. Gas plasma flow from a constricted plasma source was aimed at the magnetron target. Contrary to initial expectations, such plasma assistance turned out to be contra-productive because it led to the extinction of the magnetron discharge. The effect can be explained by gas rarefaction. A better method of reducing the necessary gas pressure is operation at relatively high pulse repetition rates where the afterglow plasma of one pulse assists in the development of the next pulse. Here we show that this method, known from medium-frequency (MF) pulsed sputtering, is also very important at the much lower pulse repetition rates of HiPIMS. A minimum in the possible operational pressure is found in the frequency region between HiPIMS and MF pulsed sputtering.

  5. S-band relativistic magnetron operation with an active plasma cathode

    SciTech Connect

    Hadas, Y.; Sayapin, A.; Kweller, T.; Krasik, Ya. E.

    2009-04-15

    Results of experimental research on a relativistic S-band magnetron with a ferroelectric plasma source as a cathode are presented. The cathode plasma was generated using a driving pulse (approx3 kV, 200 ns) applied to the ferroelectric cathode electrodes via inductive decoupling prior to the beginning of an accelerating pulse (200 kV, 150 ns) delivered by a linear induction accelerator. The magnetron and generated microwave radiation parameters obtained for the ferroelectric plasma cathode and the explosive emission plasma were compared. It was shown that the application of the ferroelectric plasma cathode allows one to avoid a time delay in the appearance of the electron emission to achieve a better matching between the magnetron and linear induction accelerator impedances and to increase significantly (approx30%) the duration of the microwave pulse with an approx10% increase in the microwave power. The latter results in the microwave radiation generation being 30% more efficient than when the explosive emission cathode is used, where efficiency does not exceed 20%.

  6. Fabrication of hydrogenated microcrystalline silicon thin films using RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Wang, Hsuan-Wen; Su, Wei-Ning; Han, Chia-Wei; Chen, Sheng-Hui; Lee, Cheng-Chung

    2007-09-01

    Hydrogenated microcrystalline silicon (μc-Si:H ) thin films have attracted many attentions due to the high mobility compared with the amorphous silicon (a-Si) thin films. To fabricate μc-Si:H thin films, plasma-enhance chemical vapor deposition (PECVD) is the most popular method. The disadvantages of PECVD are the high facility cost and using the toxic processing gases such as silane (SiH 4). Whereas there is no these disadvantages using radio-frequency (RF) magnetron sputtering to deposit silicon thin films. Unfortunately, the silicon thin films deposited by the regular RF magnetron sputtering are a-Si. In this study, μc-Si:H thin films were fabricated using RF magnetron sputtering with argon and hydrogen as working gas at low substrate temperature (T s=250°C and 350°C).The grain sizes, crystal volume fractions and photosensitivity (ratios of dark conductivities and photo conductivities) of the μc-Si:H thin films which deposited with different hydrogen partial pressures and sputtering powers were analyzed. The results showed that the grain sizes and the crystal volume fractions were increased and the photosensitivity was decreased as the hydrogen partial pressure increased at the sputtering power 200W. The grain size was between 15 to 20 nm and the crystal volume fractions was between 75 to 80% when the hydrogen partial pressure was over 90%.

  7. Study of hysteresis behavior in reactive sputtering of cylindrical magnetron plasma

    NASA Astrophysics Data System (ADS)

    Kakati, H.; M. Borah, S.

    2015-12-01

    In order to make sufficient use of reactive cylindrical magnetron plasma for depositing compound thin films, it is necessary to characterize the hysteresis behavior of the discharge. Cylindrical magnetron plasmas with different targets namely titanium and aluminium are studied in an argon/oxygen and an argon/nitrogen gas environment respectively. The aluminium and titanium emission lines are observed at different flows of reactive gases. The emission intensity is found to decrease with the increase of the reactive gas flow rate. The hysteresis behavior of reactive cylindrical magnetron plasma is studied by determining the variation of discharge voltage with increasing and then reducing the flow rate of reactive gas, while keeping the discharge current constant at 100 mA. Distinct hysteresis is found to be formed for the aluminium target and reactive gas oxygen. For aluminium/nitrogen, titanium/oxygen and titanium/nitrogen, there is also an indication of the formation of hysteresis; however, the characteristics of variation from metallic to reactive mode are different in different cases. The hysteresis behaviors are different for aluminium and titanium targets with the oxygen and nitrogen reactive gases, signifying the difference in reactivity between them. The effects of the argon flow rate and magnetic field on the hysteresis are studied and explained. Project supported by the Department of Science and Technology, Government of India and Council of Scientific and Industrial Research, India.

  8. Fabrication of Optical Multilayer Devices from Porous Silicon Coatings with Closed Porosity by Magnetron Sputtering.

    PubMed

    Caballero-Hernández, Jaime; Godinho, Vanda; Lacroix, Bertrand; Jiménez de Haro, Maria C; Jamon, Damien; Fernández, Asunción

    2015-07-01

    The fabrication of single-material photonic-multilayer devices is explored using a new methodology to produce porous silicon layers by magnetron sputtering. Our bottom-up methodology produces highly stable amorphous porous silicon films with a controlled refractive index using magnetron sputtering and incorporating a large amount of deposition gas inside the closed pores. The influence of the substrate bias on the formation of the closed porosity was explored here for the first time when He was used as the deposition gas. We successfully simulated, designed, and characterized Bragg reflectors and an optical microcavity that integrates these porous layers. The sharp interfaces between the dense and porous layers combined with the adequate control of the refractive index and thickness allowed for excellent agreement between the simulation and the experiments. The versatility of the magnetron sputtering technique allowed for the preparation of these structures for a wide range of substrates such as polymers while also taking advantage of the oblique angle deposition to prepare Bragg reflectors with a controlled lateral gradient in the stop band wavelengths. PMID:26046812

  9. Phased Array Technology with Phase and Amplitude Controlled Magnetron for Microwave Power Transmission

    NASA Astrophysics Data System (ADS)

    Shinohara, N.; Matsumoto, H.

    2004-12-01

    We need a microwave power transmitter with light weight and high DC-RF conversion efficiency for an economical SSPS (Space Solar Power System). We need a several g/W for a microwave power transmission (MPT) system with a phased array with 0.0001 degree of beam control accuracy (=tan-1 (100m/36,000km)) and over 80 % of DC-RF conversion efficiency when the weight of the 1GW-class SPS is below a several thousand ton - a several tens of thousand ton. We focus a microwave tube, especially magnetron by economical reason and by the amount of mass-production because it is commonly used for microwave oven in the world. At first, we have developed a phase controlled magnetron (PCM) with different technologies from what Dr. Brown developed. Next we have developed a phase and amplitude controlled magnetron (PACM). For the PACM, we add a feedback to magnetic field of the PCM with an external coil to control and stabilize amplitude of the microwave. We succeed to develop the PACM with below 10-6 of frequency stability and within 1 degree of an error in phase and within 1% of amplitude. We can control a phase and amplitude of the PACM and we have developed a phased array the PCMs. With the PCM technology, we have developed a small light weight MPT transmitter COMET (Compact Microwave Energy Transmitter) with consideration of heat radiation for space use and with consideration of mobility to space.

  10. Fabrication and characterization of flaky core-shell particles by magnetron sputtering silver onto diatomite

    NASA Astrophysics Data System (ADS)

    Wang, Yuanyuan; Zhang, Deyuan; Cai, Jun

    2016-02-01

    Diatomite has delicate porous structures and various shapes, making them ideal templates for microscopic core-shell particles fabrication. In this study, a new process of magnetron sputtering assisted with photoresist positioning was proposed to fabricate lightweight silver coated porous diatomite with superior coating quality and performance. The diatomite has been treated with different sputtering time to investigate the silver film growing process on the surface. The morphologies, constituents, phase structures and surface roughness of the silver coated diatomite were analyzed with SEM, EDS, XRD and AFM respectively. The results showed that the optimized magnetron sputtering time was 8-16 min, under which the diatomite templates were successfully coated with uniform silver film, which exhibits face centered cubic (fcc) structure, and the initial porous structures were kept. Moreover, this silver coating has lower surface roughness (RMS 4.513 ± 0.2 nm) than that obtained by electroless plating (RMS 15.692 ± 0.5 nm). And the infrared emissivity of coatings made with magnetron sputtering and electroless plating silver coated diatomite can reach to the lowest value of 0.528 and 0.716 respectively.

  11. Magnetic control of breakdown: Toward energy-efficient hollow-cathode magnetron discharges

    SciTech Connect

    Baranov, O.; Romanov, M.; Kumar, S.; Zong, X. X.; Ostrikov, K.

    2011-03-15

    Characteristics of electrical breakdown of a planar magnetron enhanced with an electromagnet and a hollow-cathode structure, are studied experimentally and numerically. At lower pressures the breakdown voltage shows a dependence on the applied magnetic field, and the voltage necessary to achieve the self-sustained discharge regime can be significantly reduced. At higher pressures, the dependence is less sensitive to the magnetic field magnitude and shows a tendency of increased breakdown voltage at the stronger magnetic fields. A model of the magnetron discharge breakdown is developed with the background gas pressure and the magnetic field used as parameters. The model describes the motion of electrons, which gain energy by passing the electric field across the magnetic field and undergo collisions with neutrals, thus generating new bulk electrons. The electrons are in turn accelerated in the electric field and effectively ionize a sufficient amount of neutrals to enable the discharge self-sustainment regime. The model is based on the assumption about the combined classical and near-wall mechanisms of electron conductivity across the magnetic field, and is consistent with the experimental results. The obtained results represent a significant advance toward energy-efficient multipurpose magnetron discharges.

  12. Dual Piezoelectric Actuation Bridge of In-Plane Polarized Lead Zirconate Titanate Film

    NASA Astrophysics Data System (ADS)

    Hwang, Hyun-Suk; Song, Joon-Tae

    2008-08-01

    A dual piezoelectric actuation bridge of in-plane polarized lead zirconate titanate (PZT) film is demonstrated. The in-plane polarized PZT film makes the development of a bending mechanism in the d33 mode, which exhibits a strain performance twice that of the d31 mode. Further, this design can provide deflection exceeding the structure thickness and individual driving mechanism for improving reliability of the devices. In order to simplify the fabrication process, a photoresist and Au are selected for the sacrificial and structural materials, respectively. The PZT thin film, which is deposited on the Au structural layer by the RF magnetron sputtering method, is poled and driven with interdigitated electrodes (IDEs) in order to exploit d33 mode actuation. The fabricated actuator exhibits good performance with a fast response time of <500 ms and low driving voltage of 5 V. This design can also be applied for a linearly tunable capacitor, depending on the magnitude of biasing voltage.

  13. Dual Tank Fuel System

    DOEpatents

    Wagner, Richard William; Burkhard, James Frank; Dauer, Kenneth John

    1999-11-16

    A dual tank fuel system has primary and secondary fuel tanks, with the primary tank including a filler pipe to receive fuel and a discharge line to deliver fuel to an engine, and with a balance pipe interconnecting the primary tank and the secondary tank. The balance pipe opens close to the bottom of each tank to direct fuel from the primary tank to the secondary tank as the primary tank is filled, and to direct fuel from the secondary tank to the primary tank as fuel is discharged from the primary tank through the discharge line. A vent line has branches connected to each tank to direct fuel vapor from the tanks as the tanks are filled, and to admit air to the tanks as fuel is delivered to the engine.

  14. Dual surface interferometer

    DOEpatents

    Pardue, Robert M.; Williams, Richard R.

    1982-01-01

    A double-pass interferometer is provided which allows direct measurement of relative displacement between opposed surfaces. A conventional plane mirror interferometer may be modified by replacing the beam-measuring path cube-corner reflector with an additional quarter-wave plate. The beam path is altered to extend to an opposed plane mirrored surface and the reflected beam is placed in interference with a retained reference beam split from dual-beam source and retroreflected by a reference cube-corner reflector mounted stationary with the interferometer housing. This permits direct measurement of opposed mirror surfaces by laser interferometry while doubling the resolution as with a conventional double-pass plane mirror laser interferometer system.

  15. Dual surface interferometer

    DOEpatents

    Pardue, R.M.; Williams, R.R.

    1980-09-12

    A double-pass interferometer is provided which allows direct measurement of relative displacement between opposed surfaces. A conventional plane mirror interferometer may be modified by replacing the beam-measuring path cube-corner reflector with an additional quarterwave plate. The beam path is altered to extend to an opposed plane mirrored surface and the reflected beam is placed in interference with a retained reference beam split from dual-beam source and retroreflected by a reference cube-corner reflector mounted stationary with the interferometer housing. This permits direct measurement of opposed mirror surfaces by laser interferometry while doubling the resolution as with a conventional double-pass plane mirror laser interferometer system.

  16. Dual-Mode Combustion

    NASA Technical Reports Server (NTRS)

    Goyne, Christopher P.; McDaniel, James C.

    2002-01-01

    The Department of Mechanical and Aerospace Engineering at the University of Virginia has conducted an investigation of the mixing and combustion processes in a hydrogen fueled dual-mode scramjet combustor. The experiment essentially consisted of the "direct connect" continuous operation of a Mach 2 rectangular combustor with a single unswept ramp fuel injector. The stagnation enthalpy of the test flow simulated a flight Mach number of 5. Measurements were obtained using conventional wall instrumentation and laser based diagnostics. These diagnostics included, pressure and wall temperature measurements, Fuel Plume Imaging (FPI) and Particle Image Velocimetry (PIV). A schematic of the combustor configuration and a summary of the measurements obtained are presented. The experimental work at UVa was parallel by Computational Fluid Dynamics (CFD) work at NASA Langley. The numerical and experiment results are compared in this document.

  17. Dual-eligible dilemma.

    PubMed

    Ortolon, Ken

    2012-06-01

    Texas physicians are feeling the pinch of a decision Texas lawmakers made last year to drastically cut what the state will pay for "dual-eligible" patients - those who are old enough to qualify for Medicare and whose income qualifies them for Medicaid. On top of those cuts, a glitch in the computer systems that are supposed to communicate claims data between Medicare and the Medicaid program meant that thousands of claims for which Medicaid should have paid at least a portion of the bill were returned with zero payment. Texas Health and Human Services Commission officials say the computer glitch is resolved, but Texas Medical Association officials and physicians in the Rio Grande Valley say the damage may already be done. PMID:22714987

  18. Dual quartz crystal microbalance

    SciTech Connect

    Dunham, G.C.; Benson, N.H.; Petelenz, D.; Janata, J. )

    1995-01-15

    Construction and performance of a dual quartz crystal microbalance is described. The final probe has a dipstick configuration that is particularly suitable for sensing and monitoring applications in viscous and/or conducting liquids. The differential (heterodyned) frequency measurement substantially eliminates the deleterious effects of viscosity, temperature, and conductivity. The corresponding performance coefficients are temperature df/dT = 1.5 Hz/[degree]C, viscosity df/d[eta][sub L] = 103 Hz/cP, and conductivity df/dM = 108 Hz/M, where conductivity is expressed in terms of molarity of sodium chloride. As an example, the etching of a 2000-A-thick layer of aluminum has been monitored as a function of time. 13 refs., 8 figs., 1 tab.

  19. Électrolytes-gels pour piles au lithium système PVdF-HFP/SiO2/VL-LiTFSI

    NASA Astrophysics Data System (ADS)

    Caillon-Caravanier, M.; Claude-Montigny, B.; Lemordant, D.; Bosser, G.

    2002-04-01

    Les électrolytes-gels étudiés sont constitués du copolymère poly (fluorure de vinylidène-hexafluoropropylène) (PVdF-HFP) contenant où non de la silice et ayant absorbé un électrolyte liquide obtenu par dissolution du (trifluorométhyl sulfone) imidure de lithium (LiTFSI) dans la gamma-valérolactone (VL) ou dans le mélange VL:EC (90:10 en moles) (EC:carbonate d'éthylène). L'influence du pourcentage en sel de lithium dans l'électrolyte liquide, de la proportion de silice dans le copolymère sec et de la température sur la capacité d'absorption est étudiée. L'évolution de la conductivité en fonction de la composition de l'électrolyte-gel et de la température ainsi que l'étude de la solvatation de l'ion Li^+ par spectroscopie RAMAN ont permis de proposer un modèle de conductivité ionique pour ces matériaux. Après avoir déterminé le domaine d'électroactivité des gels, l'évolution des spectres d'impédance à l'interface Li / gel est interprétée par le modèle “couche polymère solide" (SPL).

  20. Neuroretinitis with dual infections

    PubMed Central

    Kiu, Kwong-Han; Hanizasurana, Hashim; Zunaina, Embong

    2015-01-01

    A 22-year-old Malay female presented with left eye floaters for 2 weeks, associated with temporal visual field defect and metamorphopsia for 3 days. She has a guinea pig and a hedgehog at home, but denied being bitten or scratched by them. Her visual acuity at presentation was 6/12 on the left eye and 6/6 on the right eye. Her left eye relative afferent pupillary defect was barely positive with mild anterior chamber reaction. Fundus examination of the left eye showed mild vitritis, swollen optic disc with macular star, crops of active choroidal lesions at superonasal retina with a linear arrangement in the form of migratory track nasally. However, there were no nematodes seen on fundus examination. Investigations showed normal full blood count with no eosinophilia and positive serology test for Bartonella henselae. She was diagnosed to have dual infection – diffuse unilateral subacute neuroretinitis (DUSN), based on the presence of crops of choroidal lesions with migratory track, and cat scratch disease (CSD) based on a positive serological test. She was treated with oral albendazole 400 mg 12 hourly for 6 weeks for DUSN and oral doxycycline 100 mg 12 hourly for 4 weeks for CSD. Focal laser had been applied to the area of migratory track in the left eye. Her left eye vision improved to 6/6 at 1 month after treatment, with resolution of neuroretinitis. PMID:26527902

  1. Reactive sputtering of δ-ZrH{sub 2} thin films by high power impulse magnetron sputtering and direct current magnetron sputtering

    SciTech Connect

    Högberg, Hans Tengdelius, Lina; Eriksson, Fredrik; Broitman, Esteban; Lu, Jun; Jensen, Jens; Hultman, Lars; Samuelsson, Mattias

    2014-07-01

    Reactive sputtering by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) of a Zr target in Ar/H{sub 2} plasmas was employed to deposit Zr-H films on Si(100) substrates, and with H content up to 61 at. % and O contents typically below 0.2 at. % as determined by elastic recoil detection analysis. X-ray photoelectron spectroscopy reveals a chemical shift of ∼0.7 eV to higher binding energies for the Zr-H films compared to pure Zr films, consistent with a charge transfer from Zr to H in a zirconium hydride. X-ray diffraction shows that the films are single-phase δ-ZrH{sub 2} (CaF{sub 2} type structure) at H content >∼55 at. % and pole figure measurements give a 111 preferred orientation for these films. Scanning electron microscopy cross-section images show a glasslike microstructure for the HiPIMS films, while the DCMS films are columnar. Nanoindentation yield hardness values of 5.5–7 GPa for the δ-ZrH{sub 2} films that is slightly harder than the ∼5 GPa determined for Zr films and with coefficients of friction in the range of 0.12–0.18 to compare with the range of 0.4–0.6 obtained for Zr films. Wear resistance testing show that phase-pure δ-ZrH{sub 2} films deposited by HiPIMS exhibit up to 50 times lower wear rate compared to those containing a secondary Zr phase. Four-point probe measurements give resistivity values in the range of ∼100–120 μΩ cm for the δ-ZrH{sub 2} films, which is slightly higher compared to Zr films with values in the range 70–80 μΩ cm.

  2. Tailoring of antibacterial Ag nanostructures on TiO2 nanotube layers by magnetron sputtering.

    PubMed

    Uhm, Soo-Hyuk; Song, Doo-Hoon; Kwon, Jae-Sung; Lee, Sang-Bae; Han, Jeon-Geon; Kim, Kyoung-Nam

    2014-04-01

    To reduce the incidence of postsurgical bacterial infection that may cause implantation failure at the implant-bone interface, surface treatment of titanium implants with antibiotic materials such as silver (Ag) has been proposed. The purpose of this work was to create TiO2 nanotubes using plasma electrolytic oxidation (PEO), followed by formation of an antibacterial Ag nanostructure coating on the TiO2 nanotube layer using a magnetron sputtering system. PEO was performed on commercially pure Ti sheets. The Ag nanostructure was added onto the resulting TiO2 nanotube using magnetron sputtering at varying deposition rates. Field emission scanning electron microscopy and transmission electron microscopy were used to characterize the surface, and Ag content on the TiO2 nanotube layer was analyzed by X-ray diffraction and X-ray photoelectron spectroscopy. Scanning probe microscopy for surface roughness and contact angle measurement were used to indirectly confirm enhanced TiO2 nanotube hydrophilicity. Antibacterial activity of Ag ions in solution was determined by inductively coupled plasma mass spectrometry and antibacterial testing against Staphylococcus aureus (S. aureus). In vitro, TiO2 nanotubes coated with sputtered Ag resulted in significantly reduced S. aureus. Cell viability assays showed no toxicity for the lowest sputtering time group in the osteoblastic cell line MC3T3-E1. These results suggest that a multinanostructured layer with a biocompatible TiO2 nanotube and antimicrobial Ag coating is a promising biomaterial that can be tailored with magnetron sputtering for optimal performance. PMID:24123999

  3. Investigation of high power impulse magnetron sputtering (HIPIMS) discharge using fast ICCD camera

    NASA Astrophysics Data System (ADS)

    Hecimovic, Ante

    2012-10-01

    High power impulse magnetron sputtering (HIPIMS) combines impulse glow discharges at power levels up to the MW range with conventional magnetron cathodes to achieve a highly ionised sputtered flux. The dynamics of the HIPIMS discharge was investigated using fast Intensified Charge Coupled Device (ICCD) camera. In the first experiment the HIPIMS plasma was recorded from the side with goal to analyse the plasma intensity using Abel inversion to obtain the emissivity maps of the plasma species. Resulting emissivity maps provide the information on the spatial distribution of Ar and sputtered material and evolution of the plasma chemistry above the cathode. In the second experiment the plasma emission was recorded with camera facing the target. The images show that the HIPIMS plasma develops drift wave type instabilities characterized by well defined regions of high and low plasma emissivity along the racetrack of the magnetron. The instabilities cause periodic shifts in the floating potential. The structures rotate in ExB direction at velocities of 10 kms-1 and frequencies up to 200 kHz. The high emissivity regions comprise Ar and metal ion emission with strong Ar and metal neutral emission depletion. A detailed analysis of the temporal evolution of the saturated instabilities using four consequently triggered fast ICCD cameras is presented. Furthermore working gas pressure and discharge current variation showed that the shape and the speed of the instability strongly depend on the working gas and target material combination. In order to better understand the mechanism of the instability, different optical interference band pass filters (of metal and gas atom, and ion lines) were used to observe the spatial distribution of each species within the instability.

  4. Effect of magnetic field strength on deposition rate and energy flux in a dc magnetron sputtering system

    SciTech Connect

    Ekpe, Samuel D.; Jimenez, Francisco J.; Field, David J.; Davis, Martin J.; Dew, Steven K.

    2009-11-15

    Variations in the magnetic field strongly affect the plasma parameters in a magnetron sputtering system. This in turn affects the throughput as well as the energy flux to the substrate. The variation in the magnetic field in this study, for a dc magnetron process, is achieved by shifting the magnet assembly slightly away from the target. Measurements of the plasma parameters show that while the electron density at the substrate increases with decrease in magnetic field, the electron temperature decreases. The cooling of the electron temperature is consistent with results reported elsewhere. The deposition rate per input magnetron power is found to increase slightly with the decrease in magnetic field for the process conditions considered in this study. Results suggest that the energy flux to the substrate tends to show a general decrease with the shift in the magnet assembly.

  5. The structure and dielectric properties of thin barium zirconate titanate films obtained by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Tumarkin, A. V.; Razumov, S. V.; Gagarin, A. G.; Altynnikov, A. G.; Stozharov, V. M.; Kaptelov, E. Yu.; Senkevich, S. V.; Pronin, I. P.

    2016-02-01

    Submicron thin layers of BaZr x Ti1- x O3 are grown in-situ by RF magnetron sputtering of a ceramic target ( x = 0.50) on a substrate of Pt/ r-cut leucosapphire Al2O3. It is shown that the composition of the ferroelectric layer is not identical to the composition of the sputtered target and is shifted toward barium zirconate. The reasons for such behavior are discussed. The obtained samples are characterized by high breakdown voltages (1 MV/cm and higher). The structural and high-frequency dielectric properties are studied, and high tunability of the capacitance of thin layers is revealed.

  6. Thin-film TiPbO3 varistors obtained by two-source magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Ziaja, J.; Lewandowski, M.

    2016-02-01

    The paper presents the method of obtaining thin films of TiPbO3 by two-source magnetron sputtering DC-M. The films were obtained in a reactive process of sputtering metallic targets of titanium (Ti) and lead (Pb). The research involved the impact of the time of sputtering of the respective targets on voltage-dependent resistance of the obtained films for different power conditions, pressures of process gases and the powers provided on the targets. The obtained nonlinearity coefficients and the current-voltage I(U) characteristics were within the following range.

  7. Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas

    SciTech Connect

    Centre for Quantum Technologies, National University of Singapore, 3 Science Drive 2, 117543 Singapore, Singapore; Andersson, Joakim; Ni, Pavel; Anders, Andre

    2013-07-17

    Excitation and ionization conditions in traveling ionization zones of high power impulse magnetron sputtering plasmas were investigated using fast camera imaging through interference filters. The images, taken in end-on and side on views using light of selected gas and target atom and ion spectral lines, suggest that ionization zones are regions of enhanced densities of electrons, and excited atoms and ions. Excited atoms and ions of the target material (Al) are strongly concentrated near the target surface. Images from the highest excitation energies exhibit the most localized regions, suggesting localized Ohmic heating consistent with double layer formation.

  8. Venting temperature determines surface chemistry of magnetron sputtered TiN films

    NASA Astrophysics Data System (ADS)

    Greczynski, G.; Mráz, S.; Hultman, L.; Schneider, J. M.

    2016-01-01

    Surface properties of refractory ceramic transition metal nitride thin films grown by magnetron sputtering are essential for resistance towards oxidation necessary in all modern applications. Here, typically neglected factors, including exposure to residual process gases following the growth and the venting temperature Tv, each affecting the surface chemistry, are addressed. It is demonstrated for the TiN model materials system that Tv has a substantial effect on the composition and thickness-evolution of the reacted surface layer and should therefore be reported. The phenomena are also shown to have impact on the reliable surface characterization by x-ray photoelectron spectroscopy.

  9. Propagation direction reversal of ionization zones in the transition between high and low current magnetron sputtering

    SciTech Connect

    School of Materials Science and Engineering, State Key Lab for Materials Processing and Die & Mold Technology, Huazhong University of Science and Technology, Wuhan 430074, China; Department of Physics, University of California Berkeley, Berkeley, California 94720, USA; Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA; Yang, Yuchen; Liu, Jason; Liu, Lin; Anders, André

    2014-12-11

    Past research has revealed the propagation of dense, asymmetric ionization zones in both high and low current magnetron discharges. Here we report about the direction reversal of ionization zone propagation as observed with fast cameras. At high currents, zones move in the E B direction with velocities of 103 to 104 m/s. However at lower currents, ionization zones are observed to move in the opposite, the -E B direction, with velocities ~;; 103 m/s. It is proposed that the direction reversal is associated with the local balance of ionization and supply of neutrals in the ionization zone.

  10. Preliminary design of a magnetron injection gun for a 670 GHz gyrotron

    NASA Astrophysics Data System (ADS)

    Kesar, Amit S.; Pu, Ruifeng; Nusinovich, Gregory S.; Granatstein, Victor L.

    2010-11-01

    At present, our research team is working on the design of a 300 kW, 670 GHz gyrotron with a pulsed solenoid. The gyrotron will operate at the fundamental cyclotron resonance. The pulsed solenoid will provide magnetic fields in the range of 27-28 T. Design of a magnetron-type electron gun for such a gyrotron is done by using available numerical codes EGN2W and MICHELLE. Magnetic compression of a beam in the region between the gun and a resonator is about 100; the beam voltage and current are 70 kV and 15 A, respectively. Simulation results will be presented.

  11. Magnetic field effects in RF magnetron sputtering of CdS/CdTe solar cells

    SciTech Connect

    Compaan, A.D.; Shao, M.; Tabory, C.N.; Feng, Z.; Fischer, A.; Shen, F.; Narayanswami, C.; Bohn, R.G.

    1996-01-01

    We have studied effects of magnetic field strength and configuration on rf planar magnetron sputtering of CdS and CdTe. This study was carried out with one sputter gun having an unbalanced magnetic field and a second gun having an approximately balanced magnetic field. The unbalanced field gun produces significantly higher ion and electron bombardment of the film during growth and slightly higher electron kinetic energies. Films produced with the unbalanced gun show much stronger photoluminescence and cell performance is much better when the CdTe is deposited with the unbalanced gun. {copyright} {ital 1996 American Institute of Physics.}

  12. Microstructural studies of nanocomposite thin films of Ni/CrN prepared by reactive magnetron sputtering.

    PubMed

    Kuppusami, P; Thirumurugesan, R; Divakar, R; Kataria, S; Ramaseshan, R; Mohandas, E

    2009-09-01

    Synthesis and characterization of nanocomposites of Ni/CrN thin films prepared by DC magnetron sputtering from a target of 50 wt.%Ni-50 wt.%Cr is investigated. The films prepared as a function of nitrogen flow rate and substrate temperature showed that the films contained Ni and CrN phases with crystallite sizes in the nanometer range. Measurement of nanomechanical properties of the composite films exhibited a significant decrease in the values of hardness and Young's modulus than those of pure CrN films. PMID:19928270

  13. Hydrogen and Cesium Monitor for H- Magnetron Sources

    SciTech Connect

    Tan, Cheng-Yang; Bollinger, Dan; Schupbach, Brian; Seiya, Kiyomi

    2014-07-01

    The relative concentration of cesium to hydrogen in the plasma of a H- magnetron source is an important parameter for reliable operations. If there is too much cesium, the surfaces of the source become contaminated with it and sparking occurs. If there is too little cesium then the plasma cannot be sustained. In order to monitor these two elements, a spectrometer has been built and installed on a test and operating source that looks at the plasma. It is hypothesized that the concentration of each element in the plasma is proportional to the intensity of their spectral lines.

  14. Determine the Dispersion Relation of an A6 Magnetron Using Conformal Finite Difference Time Domain Method

    NASA Astrophysics Data System (ADS)

    Lin, M. C.; Nieter, C.; Stoltz, P. H.; Smithe, D. N.

    2009-05-01

    This work introduces a conformal finite difference time domain (CFDTD) method to accurately determine the dispersion relation of an A6 relativistic magnetron. The accuracy is measured by comparing with accurate SUPERFISH calculations based on finite element method. The results show that an accuracy of 99.4% can be achieved by using only 10,000 mesh points with Dey-Mittra algorithm. By comparison, a mesh number of 360,000 is needed to preserve 99% accuracy using conventional FDTD method. This suggests one can efficiently and accurately study the hot tests of microwave tubes using CFDTD particle-in-cell method instead of conventional FDTD one.

  15. Plasma reactivity in high-power impulse magnetron sputtering through oxygen kinetics

    SciTech Connect

    Vitelaru, Catalin; Lundin, Daniel; Brenning, Nils; Minea, Tiberiu

    2013-09-02

    The atomic oxygen metastable dynamics in a Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS) discharge has been characterized using time-resolved diode laser absorption in an Ar/O{sub 2} gas mixture with a Ti target. Two plasma regions are identified: the ionization region (IR) close to the target and further out the diffusion region (DR), separated by a transition region. The μs temporal resolution allows identifying the main atomic oxygen production and destruction routes, which are found to be very different during the pulse as compared to the afterglow as deduced from their evolution in space and time.

  16. Alfven's critical ionization velocity observed in high power impulse magnetron sputtering discharges

    SciTech Connect

    Brenning, N.; Lundin, D.

    2012-09-15

    Azimuthally rotating dense plasma structures, spokes, have recently been detected in several high power impulse magnetron sputtering (HiPIMS) devices used for thin film deposition and surface treatment, and are thought to be important for plasma buildup, energizing of electrons, as well as cross-B transport of charged particles. In this work, the drift velocities of these spokes are shown to be strongly correlated with the critical ionization velocity, CIV, proposed by Alfven. It is proposed as the most promising approach in combining the CIV and HiPIMS research fields is to focus on the role of spokes in the process of electron energization.

  17. Spoke rotation reversal in magnetron discharges of aluminium, chromium and titanium

    NASA Astrophysics Data System (ADS)

    Hecimovic, A.; Maszl, C.; Schulz-von der Gathen, V.; Böke, M.; von Keudell, A.

    2016-06-01

    The rotation of localised ionisation zones, i.e. spokes, in magnetron discharge are frequently observed. The spokes are investigated by measuring floating potential oscillations with 12 flat probes placed azimuthally around a planar circular magnetron. The 12-probe setup provides sufficient temporal and spatial resolution to observe the properties of various spokes, such as rotation direction, mode number and angular velocity. The spokes are investigated as a function of discharge current, ranging from 10 mA (current density 0.5 mA cm-2) to 140 A (7 A cm-2). In the range from 10 mA to 600 mA the plasma was sustained in DC mode, and in the range from 1 A to 140 A the plasma was pulsed in high-power impulse magnetron sputtering mode. The presence of spokes throughout the complete discharge current range indicates that the spokes are an intrinsic property of a magnetron sputtering plasma discharge. The spokes may disappear at discharge currents above 80 A for Cr, as the plasma becomes homogeneously distributed over the racetrack. Up to discharge currents of several amperes (the exact value depends on the target material), the spokes rotate in a retrograde \\mathbf{E}× \\mathbf{B} direction with angular velocity in the range of 0.2-4 km s-1. Beyond a discharge current of several amperes, the spokes rotate in a \\mathbf{E}× \\mathbf{B} direction with angular velocity in the range of 5-15 km s-1. The spoke rotation reversal is explained by a transition from Ar-dominated to metal-dominated sputtering that shifts the plasma emission zone closer to the target. The spoke itself corresponds to a region of high electron density and therefore to a hump in the electrical potential. The electric field around the spoke dominates the spoke rotation direction. At low power, the plasma is further away from the target and it is dominated by the electric field to the anode, thus retrograde \\mathbf{E}× \\mathbf{B} rotation. At high power, the plasma is closer to the target and it is

  18. Large-scale two-dimensional MoS₂ photodetectors by magnetron sputtering.

    PubMed

    Ling, Z P; Yang, R; Chai, J W; Wang, S J; Leong, W S; Tong, Y; Lei, D; Zhou, Q; Gong, X; Chi, D Z; Ang, K-W

    2015-05-18

    We report on the demonstration of photodetectors based on large scale two-dimensional molybdenum disulfide (MoS2) transition metal dichalcogenides. Excellent film uniformity and precise control of the MoS2 thickness down to a monolayer (~0.75nm) were achieved by magnetron sputtering synthesis approach. In particular, the photodetectors integrated with five MoS2 monolayers exhibit a high photoresponsivity of 1.8 A/W, an external quantum efficiency exceeding 260%, and a photodetectivity of ~5 x 10(8) Jones for a wavelength of 850 nm, surpassing the performance of mechanically exfoliated based photodetectors. PMID:26074606

  19. Structural parameters and polarization properties of TiN thin films prepared by reactive magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Solovan, M. M.; Brus, V. V.; Pidkamin, L. J.; Maryanchuk, P. D.; Dobrovolsky, Yu. G.

    2015-11-01

    We report the results of the investigation of morphological, structural, optical and plarimeteric properties of titanium nitride thin films deposited on silicon and glass substrates. The magnetron sputtered titanium nitride thin films were established to possess crystalline structure with the average grain size about D = 15 nm. The method of correlation matrix is was applied for the analysis of polarization properties of scattered light by the titanium nitride thin film. The obtained experimental result, can be explained by the presence of the effects of linear and circular dichroism in the material of the titanium nitride thin films under investigations.

  20. Different properties of aluminum doped zinc oxide nanostructured thin films prepared by radio frequency magnetron sputtering

    SciTech Connect

    Bidmeshkipour, Samina Shahtahmasebi, Nasser

    2013-06-15

    Aluminium doped zinc oxide (AZO) nanostructured thin films are prepared by radio frequency magnetron sputtering on glass substrate using specifically designed ZnO target containing different amount of Al{sub 2}O{sub 3} powder as the Al doping source. The optical properties of the aluminium doped zinc oxide films are investigated. The topography of the deposited films were investigated by Atomic Force Microscopy. Variation of the refractive index by annealing temperature are considered and it is seen that the refractive index increases by increasing the annealing temperature.

  1. Electrochemical Performance of rf Magnetron Sputtered LiCoO{sub 2} Thin Film Positive Electrodes

    SciTech Connect

    Kumar, P. Jeevan; Babu, K. Jayanth; Hussain, O. M.

    2010-12-01

    Thin films of LiCoO{sub 2} were grown by rf magnetron sputtering technique and studied the influence of In situ annealing treatment on microstructural and electrochemical properties of the films. Annealing treatment in presence of O{sub 2} ambient develops characteristic (104) plan in relative to (003) plane texture indicating that the films have HT-layered structure with R3-bar m symmetry. The effect is discussed in terms of grain size, cycling stability, reversibility and the specific discharge capacity.

  2. Texture evolution in nanocrystalline iron films deposited using biased magnetron sputtering

    SciTech Connect

    Vetterick, G.; Taheri, M. L.; Baldwin, J. K.; Misra, A.

    2014-12-21

    Fe thin films were deposited on sodium chloride (NaCl) substrates using magnetron sputtering to investigate means of texture control in free standing metal films. The Fe thin films were studied using transmission electron microscopy equipped with automated crystallographic orientation microscopy. Using this technique, the microstructure of each film was characterized in order to elucidate the effects of altering deposition parameters. The natural tendency for Fe films grown on (100) NaCl is to form a randomly oriented nanocrystalline microstructure. By careful selection of substrate and deposition conditions, it is possible to drive the texture of the film toward a single (100) orientation while retaining the nanocrystalline microstructure.

  3. Tribological evaluation of magnetron-sputtered coating for military applications. Final report, November 1994--March 1997

    SciTech Connect

    Beatty, J.H.; Huang, P.J.; Fountzoulas, C.G.; Kelly, J.V.

    1999-02-01

    There is a continuing requirement for high-performance tribological coatings in both commercial and military applications. To maximize system performance, corresponding improvements in wear resistance, high-temperature stability, Corrosion behavior, and bearing durability must be realized. In the ongoing study, a number of different coatings were applied to 52100 bearing steel, 4340 steel, Inconel 718, and Ti-6Al-4V to improve wear characteristics, corrosion resistance, and rolling contact fatigue behavior. This report deals with CrN, TiN, W, and Ta coatings deposited by magnetron sputtering. Data on corrosion, Falex annular wear, ball-on-disk, and rolling contact fatigue are presented.

  4. Ion energies in high power impulse magnetron sputtering with and without localized ionization zones

    SciTech Connect

    Yang, Yuchen; Tanaka, Koichi; Liu, Jason; Anders, André

    2015-03-23

    High speed imaging of high power impulse magnetron sputtering discharges has revealed that ionization is localized in moving ionization zones but localization disappears at high currents for high yield targets. This offers an opportunity to study the effect ionization zones have on ion energies. We measure that ions have generally higher energies when ionization zones are present, supporting the concept that these zones are associated with moving potential humps. We propose that the disappearance of ionization zones is caused by an increased supply of atoms from the target which cools electrons and reduces depletion of atoms to be ionized.

  5. Optical properties and residual stress in Nb-Si composite films prepared by magnetron cosputtering.

    PubMed

    Tang, Chien-Jen; Porter, Glen Andrew; Jaing, Cheng-Chung; Tsai, Fang-Ming

    2015-02-01

    This paper investigates Nb-Si metal composite films with various proportions of niobium in comparison to pure Nb films. Films were prepared by two-target RF-DC magnetron cosputtering deposition. The optical properties and residual stress were analyzed. A composition of Nb(0.74)Si(0.26) was chosen toward the design and fabrication of solar absorbing coatings having a high absorption in a broad wavelength range, a low residual stress, and suitable optical constants. The layer thicknesses and absorption characteristics of the Nb-Si composite films adhere more closely to the design than other coatings made of dielectric film materials. PMID:25967812

  6. Recent advances in Pt coating of microspheres by a batch magnetron sputtering process

    SciTech Connect

    Hsieh, E.J.; Meyer, S.F.

    1980-08-29

    Some proposed inertial confinement fusion targets require high-Z, high density metal coatings on glass microspheres. Platinum, which satisfies the high-Z and density requirements, can be coated onto microspheres with a batch magnetron sputtering process incorporating oxygen as a dopant gas to prevent the microspheres from sticking. This paper outlines recent progress in three areas: First, the coating process has been improved; second, the oxygen content and resistivity of the oxygen doped platinum films are analyzed; and third, the roles oxygen may play in reducing microsphere sticking during sputtering are discussed in regard to cold welding, Van der Waals bonding, electrostatic sticking, and sintering.

  7. Preparation of DC reactive magnetron sputtered ZnO thin film towards photovoltaic applications

    NASA Astrophysics Data System (ADS)

    Prabhu, M.; Sivanantham, A.; Kannan, P. Karthick; Vishnukanthan, V.; Mayandi, J.

    2013-06-01

    Zinc oxide thin films deposited on glass and p-type silicon (100) substrates by DC reactive magnetron sputtering are reported here. The XRD investigations confirmed that the thin films deposited by this technique have hexagonal wurtzite structure. AFM results present the surface morphology and roughness of the deposited thin films. From the optical absorption spectrum, the band gap of the thin film is found to be ˜ 3.2 eV. The photoluminescence spectrum of the sample has an UV emission peak centered at 407 nm with broad visible emission in the range of 500-580 nm.

  8. Characteristics of Cu-doped amorphous NiO thin films formed by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Sato, Kazuya; Kim, Sangcheol; Komuro, Shuji; Zhao, Xinwei

    2016-06-01

    Transparent conducting Cu-doped NiO thin films were deposited on quartz glass substrates by radio frequency magnetron spattering. The fabricated thin films were all in amorphous phase. A relatively high transmittance of 73% was achieved. The density ratio of Ni3+/(Ni2+ + Ni3+) ions in the films decreased with increasing O2 gas pressure in the fabrication chamber, which caused a decrease in the carrier concentration of the films. The increasing pressure also led to the increase in Hall mobility. By controlling the chamber pressure and substrate temperature, p-type transparent conducting NiO films with reasonable electrical properties were obtained.

  9. Performance of the BNL Mk-V steady state magnetron H source

    SciTech Connect

    Hershcovitch, A.; Prelec, K.; Alessi, J.

    1981-01-01

    The MkV magnetron source has been designed with the goal to achieve an H-or D-yield of 1-2 A in pulses longer than 5 a up to a steady state mode of operation. All electrodes are water cooled and this allows power densities up to 200 W/cm/sup 2/. The source has been operated in hydrogen and hydrogen-cesium modes. Various methods of cesium vapor injection have been tried and their reliability compared. The extractor grid in its first version has been made out of solid molybdenum, without cooling, and operated in a pulsed mode (pulse length more than 1 s).

  10. Direct-current magnetron fabrication of indium tin oxide/InP solar cells

    NASA Technical Reports Server (NTRS)

    Coutts, T. J.; Wu, X.; Gessert, T. A.; Li, X.

    1988-01-01

    Efficient solar cells of indium tin oxide (ITO)/InP have been fabricated using dc magnetron deposition of the ITO into single-crystal InP substrates. Efficiencies of over 16.5 percent have been achieved, the highest ever recorded for devices of this construction. The results of studies of the annealing behavior of the cells and observations of interfacial changes using Raman spectroscopy and secondary ion mass spectroscopy, together with measurements of light and dark current/voltage and quantum efficiency characteristics, are used to model the behavior of the cells and explain their lack of sensitivity to fabrication conditions.

  11. Use of an Injection Locked Magnetron to Drive a Superconducting RF Cavity

    SciTech Connect

    Haipeng Wang, Robert Rimmer, G. Davis, Imran Tahir, Amos Dexter, Greame Burt, Richard Carter

    2010-05-01

    The use of an injection locked CW magnetron to drive a 2.45 GHz superconducting RF cavity has been successfully demonstrated. With a locking power less than -27 dB with respect to the output and with a phase control system acting on the locking signal, cavity phase was accurately controlled for hours at a time without loss of lock whilst suppressing microphonics. The phase control accuracy achieved was 0.8 deg. r.m.s. The main contributing disturbance limiting ultimate phase control was power supply ripple from the low specification switch mode power supply used for the experiment.

  12. Pulsed DC magnetron sputtered piezoelectric thin film aluminum nitride - Technology and piezoelectric properties

    NASA Astrophysics Data System (ADS)

    Stoeckel, C.; Kaufmann, C.; Hahn, R.; Schulze, R.; Billep, D.; Gessner, T.

    2014-07-01

    Pulsed DC magnetron sputtered aluminum nitride (AlN) thin films are prepared on several seed layers and at different sputtering conditions. The piezoelectric c-axis (002) orientation of the AlN is analyzed with X-ray diffraction method. The transverse piezoelectric coefficient d31 is determined with a Laser-Doppler-Vibrometer at cantilevers and membranes by analytical calculations and finite element method. Additionally, thin film AlN on bulk silicon is used to characterize the longitudinal piezoelectric charge coefficient d33.

  13. Pulsed DC magnetron sputtered piezoelectric thin film aluminum nitride – Technology and piezoelectric properties

    SciTech Connect

    Stoeckel, C. Kaufmann, C.; Hahn, R.; Schulze, R.; Billep, D.; Gessner, T.

    2014-07-21

    Pulsed DC magnetron sputtered aluminum nitride (AlN) thin films are prepared on several seed layers and at different sputtering conditions. The piezoelectric c-axis (002) orientation of the AlN is analyzed with X-ray diffraction method. The transverse piezoelectric coefficient d{sub 31} is determined with a Laser-Doppler-Vibrometer at cantilevers and membranes by analytical calculations and finite element method. Additionally, thin film AlN on bulk silicon is used to characterize the longitudinal piezoelectric charge coefficient d{sub 33}.

  14. A W-band sixth-harmonic magnetron-type slotted peniotron

    SciTech Connect

    Hu Biao; Li Jiayin; Wu Xinhui; Li Tianming; Li Hao; Wang Haiyang; Zhao Xiaoyun

    2013-04-15

    This paper has numerically investigated operating characteristics of a w-band six-harmonic magnetron-type slotted peniotron with 7 vanes. With the new structure design, a high efficiency of 40% w-band 30 kW medium power microwave source has been achieved and the mode competition can be somewhat suppressed. The main advantage of such a peniotron, based on a permanent magnet, is that it can have much more compact size and lower cost, and its operation gap can be greatly reduced.

  15. Velocity distribution of neutral species during magnetron sputtering by Fabry-Perot interferometry

    SciTech Connect

    Britun, N.; Han, J. G.; Oh, S.-G.

    2008-04-07

    The velocity distribution of a metallic neutral species sputtered in a dc magnetron discharge was measured using a planar Fabry-Perot interferometer and a hollow cathode lamp as a reference source. The measurement was performed under different angles of view relative to the target surface. The velocity distribution function in the direction perpendicular to the target becomes asymmetrical as the Ar pressure decreases, whereas it remains nearly symmetrical when the line of sight is parallel to the target surface. The average velocity of the sputtered Ti atoms was measured to be about 2 km/s.

  16. Development of high-vacuum planar magnetron sputtering using an advanced magnetic field geometry

    SciTech Connect

    Ohno, Takahiro; Yagyu, Daisuke; Saito, Shigeru Ohno, Yasunori; Itoh, Masatoshi; Uhara, Yoshio; Miura, Tsutomu; Nakano, Hirofumi

    2015-11-15

    A permanent magnet in a new magnetic field geometry (namely, with the magnetization in the radial direction) was fabricated and used for high-vacuum planar magnetron sputtering using Penning discharge. Because of the development of this magnet, the discharge current and deposition rate were increased two to three times in comparison with the values attainable with a magnet in the conventional geometry. This improvement was because the available space for effective discharge of the energetic electrons for the ionization increased because the magnetic field distribution increased in both the axial and radial directions of discharge.

  17. Study of thin TiC xN 1-x films fabricated by hybrid magnetron-laser deposition

    NASA Astrophysics Data System (ADS)

    Kocourek, Tomáš; Jelínek, Miroslav; Studnička, Václav; Kadlec, Jaromír

    2006-02-01

    Titanium- carbonitride thin films were grown at room temperature using a hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition (MSPLD). Carbon and titanium were simultaneously deposited on the same Si substrate, dimensions of 3 cm × 3 cm. Films were fabricated in argon- nitrogen atmosphere of 1 Pa - 5 Pa, for laser fluence of 15 Jcm -2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Film crystallinity was studied by XRD and the composition depth profile of TiCN layers by glow discharge optical emission spectroscopy (GDOES).

  18. Orbital motion of dust particles in an rf magnetron discharge. Ion drag force or neutral atom wind force

    SciTech Connect

    Pal, A. F.; Ryabinkin, A. N.; Serov, A. O.; Dyatko, N. A.; Starostin, A. N.; Filippov, A. V.

    2012-03-15

    Microparticles with sizes up to 130 {mu}m have been confined and the velocity and diameter of particles in a plasma trap of an rf magnetron discharge with an arc magnetic field have been simultaneously measured. The motion of the gas induced by electron and ion cyclotron currents has been numerically simulated using the Navier-Stokes equation. The experimental and numerical results confirm the mechanism of the orbital motion of dust particles in the magnetron discharge plasma that is associated with the orbital motion of the neutral gas accelerated by electron and ion drift flows in crossed electric and magnetic fields.

  19. Characteristics of end Hall ion source with magnetron hollow cathode discharge

    NASA Astrophysics Data System (ADS)

    Tang, Deli; Wang, Lisheng; Pu, Shihao; Cheng, Changming; Chu, Paul K.

    2007-04-01

    An end Hall ion source with magnetron hollow cathode discharge is described. The source is suitable for high current, low energy ion beam applications such as Hall current plasma accelerators. The end Hall ion source is based on an anode layer thruster with closed drift electrons that move in a closed path in the E × B field. Only a simple magnetron power supply is used in the ion source. The special configuration enables uninterrupted and expanded operation with oxygen as well as other reactive gases because of the absence of an electron source in the ion source. In our evaluation, the ion beam current was measured by a circular electrostatic probe and the energy distribution of the ion beam was measured by a retarding potential analyzer (RPA). An ion beam current density of up to 10 mA/cm2 was obtained at a mean ion energy of 100-250 eV using Ar or O2. The ion source can be operated in a stable fashion at a discharge voltage between 200 and 500 V and without additional electron triggering. The discharge power of the ion source can be easily changed by adjusting the gas flow rate and anode voltage. No water cooling is needed for power from 500 W to 2 kW. The simple and rugged ion source is suitable for industrial applications such as deposition of thin films with enhanced adhesion. The operational characteristics of the ion source are experimentally determined and discussed.

  20. Study of cobalt mononitride thin films prepared using DC and high power impulse magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Gupta, Rachana; Pandey, Nidhi; Behera, Layanta; Gupta, Mukul

    2016-05-01

    In this work we studied cobalt mononitride (CoN) thin films deposited using dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS). A Co target was sputtered using pure N2 gas alone as the sputtering medium. Obtained long-range structural ordering was studies using x-ray diffraction (XRD), short-range structure using Co L2,3 and N K absorption edges using soft x-ray absorption spectroscopy (XAS) and the surface morphology using atomic force microscopy (AFM). It was found that HiPIMS deposited films have better long-range ordering, better stoichiometric ratio for mononitride composition and smoother texture as compared to dcMS deposited films. In addition, the thermal stability of HiPIMS deposited CoN film seems to be better. On the basis of different type of plasma conditions generated in HiPIMS and dcMS process, obtained results are presented and discussed.

  1. Boron ion beam generation utilizing lanthanum hexaboride cathodes: Comparison of vacuum arc and planar magnetron glow

    NASA Astrophysics Data System (ADS)

    Nikolaev, A. G.; Oks, E. M.; Vizir, A. V.; Yushkov, G. Yu.; Frolova, V. P.

    2016-02-01

    Boron ion beams are widely used for semiconductor ion implantation and for surface modification for improving the operating parameters and increasing the lifetime of machine parts and tools. For the latter application, the purity requirements of boron ion beams are not as stringent as for semiconductor technology, and a composite cathode of lanthanum hexaboride may be suitable for the production of boron ions. We have explored the use of two different approaches to boron plasma production: vacuum arc and planar high power impulse magnetron in self-sputtering mode. For the arc discharge, the boron plasma is generated at cathode spots, whereas for the magnetron discharge, the main process is sputtering of cathode material. We present here the results of comparative test experiments for both kinds of discharge, aimed at determining the optimal discharge parameters for maximum yield of boron ions. For both discharges, the extracted ion beam current reaches hundreds of milliamps and the fraction of boron ions in the total extracted ion beam is as high as 80%.

  2. p-type semiconducting Cu2O-CoO thin films prepared by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Suzuki, Shingo; Miyata, Toshihiro; Minami, Tadatsugu

    2003-07-01

    The preparation by magnetron sputtering of p-type semiconducting thin films consisting of a multicomponent oxide composed of Cu oxide and Co oxide is described. The electrical, optical, and crystallographical properties of films deposited by rf magnetron sputtering using (Cu2O)1-x-(CoO)x powder targets were strongly dependent on not only the deposition condition but also the calcination condition as well as the CoO content of the targets. These properties drastically changed in films prepared with a CoO content around 90 mol %. All prepared films, i.e., CoO content in the range from 0 to 100 mol %, were found to be p type, or positive hole conductors, as evidenced from the Seebeck effect: Resistivities in the range from 103 to 10-3 Ω cm. A hole concentration on the order of 1016 cm-3 and a mobility on the order of 10-1 cm2/V s were obtained in an amorphous multicomponent oxide film prepared with a CoO content of 50 mol %. Fabricated thin-film pin heterojunction diodes consisting of a p-type high-resistance multicomponent oxide combined with undoped ZnO and n-type Al-doped ZnO exhibited a rectifying current-voltage characteristic.

  3. ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques

    SciTech Connect

    Purandare, Yashodhan Ehiasarian, Arutiun; Hovsepian, Papken; Santana, Antonio

    2014-05-15

    Zirconium nitride (ZrN) coatings were deposited on 1 μm finish high speed steel and 316L stainless steel test coupons. Cathodic Arc (CA) and High Power Impulse Magnetron Sputtering (HIPIMS) + Unbalanced Magnetron Sputtering (UBM) techniques were utilized to deposit coatings. CA plasmas are known to be rich in metal and gas ions of the depositing species as well as macroparticles (droplets) emitted from the arc sports. Combining HIPIMS technique with UBM in the same deposition process facilitated increased ion bombardment on the depositing species during coating growth maintaining high deposition rate. Prior to coating deposition, substrates were pretreated with Zr{sup +} rich plasma, for both arc deposited and HIPIMS deposited coatings, which led to a very high scratch adhesion value (L{sub C2}) of 100 N. Characterization results revealed the overall thickness of the coatings in the range of 2.5 μm with hardness in the range of 30–40 GPa depending on the deposition technique. Cross-sectional transmission electron microscopy and tribological experiments such as dry sliding wear tests and corrosion studies have been utilized to study the effects of ion bombardment on the structure and properties of these coatings. In all the cases, HIPIMS assisted UBM deposited coating fared equal or better than the arc deposited coatings, the reasons being discussed in this paper. Thus H+U coatings provide a good alternative to arc deposited where smooth, dense coatings are required and macrodroplets cannot be tolerated.

  4. Thin film transistor based on TiOx prepared by DC magnetron sputtering.

    PubMed

    Chung, Sung Mook; Shin, Jae-Heon; Hong, Chan-Hwa; Cheong, Woo-Seok

    2012-07-01

    This paper reports on the thin film transistor (TFT) based on TiOx prepared by direct current (DC) magnetron sputtering for the application of n-type channel transparent TFTs. A ceramic TiOx target was prepared for the sputtering of the TiO2 films. The structural, optical, and electrical properties of the TiO2 films were investigated after their heat treatment. It is observed from XRD measurement that the TiO2 films show anatase structure having (101), (004), and (105) planes after heat treatment. The anatase-structure TiO2 films show a band-gap energy of approximately 3.20 eV and a transmittance of approximately 91% (@550 nm). The bottom-gate TFTs fabricated with the TiO2 film as an n-type channel layer. These devices exhibit the on-off ratio, the field-effect mobility, and the threshold voltage of about 10(4), 0.002 cm2/Vs, and 6 V, respectively. These results indicate the possibility of applying TiO2 films depositied by DC magnetron sputtering to TiO2-based opto-electronic devices. PMID:22966586

  5. Continuous and nanostructured TiO2 films grown by dc sputtering magnetron.

    PubMed

    Sánchez, O; Vergara, L; Font, A Climent; de Melo, O; Sanz, R; Hernández-Vélez, M

    2012-12-01

    The growth of Anatase nanostructured films using dc reactive magnetron sputtering and post-annealing treatment is reported. TiO2 has been deposited on Porous Anodic Alumina Films used as templates which were previously grown in phosphoric acid solution and etched to modify their pore diameters. This synthesis via results in the formation of vertically aligned and spatially ordered TiO2 nanostructures replicating the underlying template. Previously, the growth optimization of TiO2 thin films deposited by dc magnetron sputtering on flat silicon substrates was done. The crystalline structure and Ti in-depth concentration profile were determined by grazing incidence X-ray diffraction and Rutherford backscattering spectrometry, respectively. The surface morphology of the samples was explored by mean of a Field Emission Gun scanning electron microscope. Optical properties of the nanostructured samples were studied by using the reflectance spectra received in the UV-visible range. In these spectra different band gap values and complex light absorption features were observed. PMID:23447970

  6. Deposition Rates of High Power Impulse Magnetron Sputtering: Physics and Economics

    SciTech Connect

    Anders, Andre

    2009-11-22

    Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase of the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes to due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes of the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction of the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits considered.

  7. Peculiarities in magnetron sputtering of YBCO epitaxial films for applications in superconductor electronics devices

    NASA Astrophysics Data System (ADS)

    Drozdov, Yu. N.; Masterov, D. V.; Pavlov, S. A.; Parafin, A. E.; Yunin, P. A.

    2015-11-01

    We consider the main factors determining the growth of YBa2Cu3O7-δ high- T c superconductor films during magnetron sputtering in the planar axial geometry. Special attention is paid to the increase of the growth rate of the films suitable for superconductor electronics devices. Magnetron sputtering is used for obtaining YBa2Cu3O7-δ films with high structural and electrophysical characteristics for a growth rate up to 200 nm/h, which were used in constructing microwave disk resonators and long Josephson junctions on bicrystal substrates. The unloaded Q factor of cavities exceeds 80000 at a frequency of 7.1 GHz at a temperature of 77 K, which corresponds to the best results in this field. Josephson junction of length 50-350 μm are characterized by critical current density j c = 12-33 kA/cm2 at T = 77 K and j c = 93-230 kA/cm2 at T = 6 K in zero magnetic field. The characteristic voltage I c R n is 0.8-1.96 mV.

  8. Argon–oxygen dc magnetron discharge plasma probed with ion acoustic waves

    SciTech Connect

    Saikia, Partha Saikia, Bipul Kumar; Goswami, Kalyan Sindhu; Phukan, Arindam

    2014-05-15

    The precise determination of the relative concentration of negative ions is very important for the optimization of magnetron sputtering processes, especially for those undertaken in a multicomponent background produced by adding electronegative gases, such as oxygen, to the discharge. The temporal behavior of an ion acoustic wave excited from a stainless steel grid inside the plasma chamber is used to determine the relative negative ion concentration in the magnetron discharge plasma. The phase velocity of the ion acoustic wave in the presence of negative ions is found to be faster than in a pure argon plasma, and the phase velocity increases with the oxygen partial pressure. Optical emission spectroscopy further confirms the increase in the oxygen negative ion density, along with a decrease in the argon positive ion density under the same discharge conditions. The relative negative ion concentration values measured by ion acoustic waves are compared with those measured by a single Langmuir probe, and a similarity in the results obtained by both techniques is observed.

  9. Comprehensive computer model for magnetron sputtering. I. Gas heating and rarefaction

    SciTech Connect

    Jimenez, Francisco J.; Dew, Steven K.

    2012-07-15

    The complex interaction between several variables in magnetron sputtering discharges is a challenge in developing engineering design tools for industrial applications. For instance, at high pressures, rarefaction and gas heating should no longer be neglected for determining several parameters of the process. In this article, we use a comprehensive 3D reactor-scale simulator that incorporates most phenomena of interest in a self-consistent manner to simulate the transport of sputtered particles over a wide range of pressures and powers. Calculations of aluminum deposition rates and metal vapor densities are in reasonable agreement with experiments over a wide range of pressures and powers. Of the elements investigated (Al, Ti, and Cu), copper showed the greatest rarefaction (30%) due to its higher sputtering yield. Titanium, despite a slightly lower sputtering yield than Al, shows a greater rarefaction than aluminum as more particles are reflected from the target as high energy neutrals. In this case, a more efficient energy transfer process is responsible for the higher rarefaction observed in Ti sputtering when compared to Al. The authors also observed that by sputtering at a higher pressure, the probability of electron impact ionization of sputtered particles is increased and speculate about the role of this process in contrast to penning ionization, which is believed to be the dominant ionization mechanism in magnetron sputtering.

  10. Boron ion beam generation utilizing lanthanum hexaboride cathodes: Comparison of vacuum arc and planar magnetron glow.

    PubMed

    Nikolaev, A G; Oks, E M; Vizir, A V; Yushkov, G Yu; Frolova, V P

    2016-02-01

    Boron ion beams are widely used for semiconductor ion implantation and for surface modification for improving the operating parameters and increasing the lifetime of machine parts and tools. For the latter application, the purity requirements of boron ion beams are not as stringent as for semiconductor technology, and a composite cathode of lanthanum hexaboride may be suitable for the production of boron ions. We have explored the use of two different approaches to boron plasma production: vacuum arc and planar high power impulse magnetron in self-sputtering mode. For the arc discharge, the boron plasma is generated at cathode spots, whereas for the magnetron discharge, the main process is sputtering of cathode material. We present here the results of comparative test experiments for both kinds of discharge, aimed at determining the optimal discharge parameters for maximum yield of boron ions. For both discharges, the extracted ion beam current reaches hundreds of milliamps and the fraction of boron ions in the total extracted ion beam is as high as 80%. PMID:26931963

  11. Rarefaction windows in a high-power impulse magnetron sputtering plasma

    SciTech Connect

    Palmucci, Maria; Britun, Nikolay; Konstantinidis, Stephanos; Snyders, Rony

    2013-09-21

    The velocity distribution function of the sputtered particles in the direction parallel to the planar magnetron cathode is studied by spatially- and time-resolved laser-induced fluorescence spectroscopy in a short-duration (20 μs) high-power impulse magnetron sputtering discharge. The experimental evidence for the neutral and ionized sputtered particles to have a constant (saturated) velocity at the end of the plasma on-time is demonstrated. The velocity component parallel to the target surface reaches the values of about 5 km/s for Ti atoms and ions, which is higher that the values typically measured in the direct current sputtering discharges before. The results point out on the presence of a strong gas rarefaction significantly reducing the sputtered particles energy dissipation during a certain time interval at the end of the plasma pulse, referred to as “rarefaction window” in this work. The obtained results agree with and essentially clarify the dynamics of HiPIMS discharge studied during the plasma off-time previously in the work: N. Britun, Appl. Phys. Lett. 99, 131504 (2011)

  12. Tribological properties, corrosion resistance and biocompatibility of magnetron sputtered titanium-amorphous carbon coatings

    NASA Astrophysics Data System (ADS)

    Dhandapani, Vishnu Shankar; Subbiah, Ramesh; Thangavel, Elangovan; Arumugam, Madhankumar; Park, Kwideok; Gasem, Zuhair M.; Veeraragavan, Veeravazhuthi; Kim, Dae-Eun

    2016-05-01

    Amorphous carbon incorporated with titanium (a-C:Ti) was coated on 316L stainless steel (SS) by magnetron sputtering technique to attain superior tribological properties, corrosion resistance and biocompatibility. The morphology, topography and functional groups of the nanostructured a-C:Ti coatings in various concentrations were analyzed using atomic force microscopy (AFM), Raman, X-Ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). Raman and XPS analyses confirmed the increase in sp2 bonds with increasing titanium content in the a-C matrix. TEM analysis confirmed the composite nature of the coating and the presence of nanostructured TiC for Ti content of 2.33 at.%. This coating showed superior tribological properties compared to the other a-C:Ti coatings. Furthermore, electrochemical corrosion studies were performed against stimulated body fluid medium in which all the a-C:Ti coatings showed improved corrosion resistance than the pure a-C coating. Preosteoblasts proliferation and viability on the specimens were tested and the results showed that a-C:Ti coatings with relatively high Ti (3.77 at.%) content had better biocompatibility. Based on the results of this work, highly durable coatings with good biocompatibility could be achieved by incorporation of optimum amount of Ti in a-C coatings deposited on SS by magnetron sputtering technique.

  13. Growth of Bi2O3 nanocones over large areas by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Tien, Li-Chia; Liou, Ying-Hong

    2015-08-01

    Bismuth oxide (Bi2O3) is a multi-functional oxide semiconductor with various properties of interest such as high reflective index, high photoconductive response, luminescence and high oxygen-ion conductivity, potentially useful as optical coatings, electrodes of solid oxide fuel cells (SOFC), supercapacitors, visible-light activated photocatalysts, and gas sensors. Large areas of bismuth oxide (Bi2O3) nanocones were grown onto Si(001) substrates by magnetron sputtering. The samples were characterized by field emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM), and photoluminescence (PL). The obtained tapered nanostructures consist of high-density nanocones with diameters approximately 70-130 nm and lengths of 1-3 μm. XRD results reveal that the Bi2O3 nanocones can undergo a phase transition from the α to the β phase at growth temperatures over 450°C. This phase transition was confirmed by TEM and PL. The growth mechanism of Bi2O3 nanocones was identified as grain boundary-assisted growth, in which a Bi seeding layer is crucial to the formation of the nanostructures. The results herein suggest that introducing a surface seeding layer may provide an effective way to grow various 1D nanostructures over large areas in high yield by magnetron sputtering.

  14. Structure evolution of magnetron sputtered TiO{sub 2} thin films

    SciTech Connect

    Mraz, Stanislav; Schneider, Jochen M.

    2011-01-15

    The structure evolution of TiO{sub 2} thin films deposited by rf and dc magnetron sputtering onto nonintentionally heated, floating, glass and Si (100) substrates was investigated. As the total pressure was varied from 0.15 to 4.0 Pa, corresponding to the pressure-distance product values from 10.5 to 280 Pa mm, rutile, anatase, and a mixture thereof were deposited. The pressure-distance induced changes in ion energy were quantified by probing the ion energy distribution functions. The ion energy during synthesis was additionally varied by applying a substrate bias potential ranging from floating to -100 V revealing a similar phase formation characteristic. While the structure evolution of the TiO{sub 2} thin films reported in the literature exhibits a rather complex dependence on the process parameters, a simple correlation between the structure evolution and the ratio between the ion energy flux and the deposition flux was identified here. Phase pure anatase films were grown below 540 eV/Ti atom and phase pure rutile films were grown above 1000 eV/Ti atom. The here presented data suggest that the ratio between the ion energy flux and the deposition flux ratio defines the phase formation of TiO{sub 2} thin films during magnetron sputtering.

  15. Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. I. Negative ions

    SciTech Connect

    Welzel, Th.; Ellmer, K.; Naumov, S.

    2011-04-01

    Mass and energy spectra of negative ions in magnetron sputtering discharges have been investigated with an energy-dispersive mass spectrometer. The dc magnetrons have been operated in the same reactive Ar/O{sub 2} atmosphere but with three different target materials: Cu, In, and W. Besides negative ions of the working gas, a variety of target metal containing negative molecular ions were found in the discharge. Their occurrence is strongly dependent on the target material. It has been correlated to the electron affinity and the bond strength of the molecules which has been calculated by density functional theory. Energy spectra of the negative ions exhibit three contributions that are clearly distinguishable. Their different origin is discussed as electron attachment in the gas phase and at the target surface, and molecule fragmentation during transport from target to substrate. The latter two contributions again significantly deviate for different target material. The high-energy part of the spectra has been analyzed with respect to the energy the particles gain upon release from the surface. It suggests that bigger molecules formed on the surface are released by ion-assisted desorption.

  16. Studying of nanocomposite films’ structure and properties obtained by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Tleukenov, Y. O.; Plotnikov, S. V.; Erdybaeva, N. K.; Pogrebnyak, A. D.

    2016-02-01

    Various approaches to creating multicomponent na-nocomposite coatings of high and superhigh hardness (from 30 to 100 ± 120 GPa) are reviewed with particular emphasis placed on mechanisms underlying the increase in hardness in thin coatings. Nanocomposite Nb-Al-N films fabricated by magnetron sputtering were researched in this work. Two stable crystalline structural states were found in the films: NbNch and solid solution B1-NbxAl1-xNyO1-y, and also an amorphous component associated with aluminum oxynitride with reactive magnetron sputtering. A relationship of substructural characteristics sensitivity with the current and nanohardness and Knoop hardness characteristic was determined in this paper. Recent changes in the range of 29-33.5 GPa and 46-48 GPa, respectively. Initial principle calculations of NbN and Nb2AlN phases and NbN/AlN heterostructures were carried out for the interpretation of the results. Deposited nanocomposite films with the given mechanical properties may be used as wear resistant or protective coatings. On the basis of these results, it can be assumed that two stable crystalline structural states were found in the films: B1-NbNx and solid solution with a composition close to the B1-Nb0-67Al0-33N. The films also contain an amorphous component associated with aluminum nitride.

  17. Full System Model of Magnetron Sputter Chamber - Proof-of-Principle Study

    SciTech Connect

    Walton, C; Gilmer, G; Zepeda-Ruiz, L; Wemhoff, A; Barbee, T

    2007-05-04

    The lack of detailed knowledge of internal process conditions remains a key challenge in magnetron sputtering, both for chamber design and for process development. Fundamental information such as the pressure and temperature distribution of the sputter gas, and the energies and arrival angles of the sputtered atoms and other energetic species is often missing, or is only estimated from general formulas. However, open-source or low-cost tools are available for modeling most steps of the sputter process, which can give more accurate and complete data than textbook estimates, using only desktop computations. To get a better understanding of magnetron sputtering, we have collected existing models for the 5 major process steps: the input and distribution of the neutral background gas using Direct Simulation Monte Carlo (DSMC), dynamics of the plasma using Particle In Cell-Monte Carlo Collision (PIC-MCC), impact of ions on the target using molecular dynamics (MD), transport of sputtered atoms to the substrate using DSMC, and growth of the film using hybrid Kinetic Monte Carlo (KMC) and MD methods. Models have been tested against experimental measurements. For example, gas rarefaction as observed by Rossnagel and others has been reproduced, and it is associated with a local pressure increase of {approx}50% which may strongly influence film properties such as stress. Results on energies and arrival angles of sputtered atoms and reflected gas neutrals are applied to the Kinetic Monte Carlo simulation of film growth. Model results and applications to growth of dense Cu and Be films are presented.

  18. Deposition rates of high power impulse magnetron sputtering: Physics and economics

    SciTech Connect

    Anders, Andre

    2010-07-15

    Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase in the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes in the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction in the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits are considered.

  19. Operation of cold-cathode magnetron gauges in high magnetic fields

    SciTech Connect

    Thomas, S.R. Jr.; Goerz, D.A.; Pickles, W.L.

    1986-05-01

    The Mirror Fusion Test Facility (MFTF-B), under construction at LLNL, requires measurement of the neutral gas density in high magnetic fields near the plasma at several axial regions. This background gas pressure (BGP) diagnostic will help us understand the role of background neutrals in particle and power balance, particularly in the maintenance of the cold halo plasma that shields the hot core plasma from the returning neutrals. The BGP consists of several cold-cathode, magnetron-type gauges stripped of their permanent magnets, and utilizes the MFTF-B ambient B-field in strengths of 5--25 kG. Similar gauges have operated in TMX-U in B-fields up to 3 kG. To determine how well the gauges will perform, we assembled a test stand which operated magnetron gauges in an external, uniform magnetic field of up to 30 kG, over a pressure range of 10/sup -8/--10/sup -5/ Torr, at several cathode voltages. This paper describes the test stand and presents the results of the tests.

  20. The spatial distribution of negative oxygen ion densities in a dc reactive magnetron discharge

    NASA Astrophysics Data System (ADS)

    Scribbins, Steven; Bowes, Michael; Bradley, James W.

    2013-01-01

    Using Langmuir probe-assisted eclipse laser photodetachment, the spatial distribution of O- densities in the bulk plasma of magnetron sputter tool has been determined for a range of pressures, 0.79 to 2.40 Pa. The discharge was operated in dc (200 W) with a Ti target and a fixed oxygen-argon pressure ratio of 0.2, in poisoned mode. Measurements show significant O- densities occupying an annulus downstream from the magnetic trap in regions of most positive plasma potential. With increasing pressure the region of high O- density expands and the peak densities increase reaching ˜1.5 × 1016 m-3 at 2.40 Pa, corresponding to an O- to electron density ratio (electronegativity α) of ˜2. Outside the area of dense negative ions, and in regions of the magnetic trap accessible to our probe we measure α < 0.2. The results show that these reactive magnetron plasmas, utilized for oxide film production, to be highly electronegative in regions close to the substrate.

  1. Facing-target mid-frequency magnetron reactive sputtered hafnium oxide film: Morphology and electrical properties

    NASA Astrophysics Data System (ADS)

    Zhang, Yu; Xu, Jun; Wang, You-Nian; Choi, Chi Kyu; Zhou, Da-Yu

    2016-03-01

    Amorphous hafnium dioxide (HfO2) film was prepared on Si (100) by facing-target mid-frequency reactive magnetron sputtering under different oxygen/argon gas ratio at room temperature with high purity Hf target. 3D surface profiler results showed that the deposition rates of HfO2 thin film under different O2/Ar gas ratio remain unchanged, indicating that the facing target midfrequency magnetron sputtering system provides effective approach to eliminate target poisoning phenomenon which is generally occurred in reactive sputtering procedure. X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR) demonstrated that the gradual reduction of oxygen vacancy concentration and the densification of deposited film structure with the increase of oxygen/argon (O2/Ar) gas flow ratio. Atomic force microscopy (AFM) analysis suggested that the surface of the as-deposited HfO2 thin film tends to be smoother, the root-meansquare roughness (RMS) reduced from 0.876 nm to 0.333 nm while O2/Ar gas flow ratio increased from 1/4 to 1/1. Current-Voltage measurements of MOS capacitor based on Au/HfO2/Si structure indicated that the leakage current density of HfO2 thin films decreased by increasing of oxygen partial pressure, which resulted in the variations of pore size and oxygen vacancy concentration in deposited thin films. Based on the above characterization results the leakage current mechanism for all samples was discussed systematically.

  2. The electromagnetic shielding of Ni films deposited on cenosphere particles by magnetron sputtering method

    NASA Astrophysics Data System (ADS)

    Yu, Xiaozheng; Shen, Zhigang

    2009-09-01

    Ni-coated cenosphere particles were successfully fabricated by an ultrasonic-assisted magnetron sputtering equipment. Their surface morphology and microstructure were analyzed using field emission scanning electron microscopy (FE-SEM) and X-ray diffraction (XRD). FE-SEM results indicate that the Ni films coated by magnetron sputtering are uniform and compact. Ni film uniformity was related with the sputtering power and a large uniform film could be achieved at lower sputtering power. XRD results imply that the Ni film coated on cenospheres was a face-centered cubic (fcc) structure and the crystallization of film sample increases with increasing the sputtering power. The electromagnetic interference (EMI) shielding effectiveness (SE) of Ni-coated cenosphere particles were measured to be 4-27 dB over a frequency range 80-100 GHz, higher than those of uncoated cenosphere particles. The higher sputtering power and Ni film thickness are the higher EMI SE of the specimens. Ni-coated cenosphere particles are most promising alternative candidates for millimeter wave EMI shielding due to their lightweight, low cost, ease of processing, high floating time, good dispersion and tunable conductivities as compared with typical electromagnetic wave countermeasure materials.

  3. UWB dual burst transmit driver

    SciTech Connect

    Dallum, Gregory E.; Pratt, Garth C.; Haugen, Peter C.; Zumstein, James M.; Vigars, Mark L.; Romero, Carlos E.

    2012-04-17

    A dual burst transmitter for ultra-wideband (UWB) communication systems generates a pair of precisely spaced RF bursts from a single trigger event. An input trigger pulse produces two oscillator trigger pulses, an initial pulse and a delayed pulse, in a dual trigger generator. The two oscillator trigger pulses drive a gated RF burst (power output) oscillator. A bias driver circuit gates the RF output oscillator on and off and sets the RF burst packet width. The bias driver also level shifts the drive signal to the level that is required for the RF output device.

  4. Dual porosity gas evolving electrode

    DOEpatents

    Townsend, Carl W.

    1994-01-01

    A dual porosity electrode for use in thermoelectrochemical systems where simultaneous transport of gas and liquid into and/or out of the electrode is required. The electrode includes catalytic electrode particles having diameters ranging from about 25 to 100 angstroms. The catalytic electrode particles are anchored to a support network in clusters which have internal pores ranging in size from 25 to 100 angstroms. The pores between the clusters range in size from between about 1 to 20 microns. A method for making the dual porosity electrodes is also disclosed.

  5. Dual porosity gas evolving electrode

    DOEpatents

    Townsend, C.W.

    1994-11-15

    A dual porosity electrode is described for use in thermoelectrochemical systems where simultaneous transport of gas and liquid into and/or out of the electrode is required. The electrode includes catalytic electrode particles having diameters ranging from about 25 to 100 angstroms. The catalytic electrode particles are anchored to a support network in clusters which have internal pores ranging in size from 25 to 100 angstroms. The pores between the clusters range in size from between about 1 to 20 microns. A method for making the dual porosity electrodes is also disclosed.

  6. Titanium Aluminum Nitride Films Deposited by AC Reactive Magnetron Sputtering: Study of Positioning Effect in an Inverted Cylindrical Magnetron Sputtering System

    NASA Astrophysics Data System (ADS)

    Vandross, George Clinton, II

    TiAlN films were deposited on glass substrates by AC magnetron sputtering at 2 kW with constant Argon and Nitrogen gas flow rates to study the effects of positioning on the deposited films. The deposition system used was an ICM-10 IsoFlux cylindrical magnetron sputtering chamber. The samples were placed in different positions and tilts with respect to the location of the Titanium and Aluminum targets in the chamber. It was found that with change in position and application of tilts, deposited films acquired different physical and chemical properties. It is believed that the differences in these properties were caused by to the change in the incident angle of bombardment of the samples, and the change in surface areas of the samples presented to the targets at each location. As related to the physical traits of the samples, analysis using Scanning Electron Microscopy of the samples displayed variations in the topography, where differences in grain density could be noted as well as structure formations. The chemical properties were also noted to be affected by the variation of tilt and position applied to the sample. X-ray Diffraction Spectroscopy analysis of the samples showed the intensity of the TiAlN characteristic peak of the samples to differ from sample to sample. Results from the XRD analysis of this work showed a 157% and 176% increase in peak intensity of the 0° tilt sample of the Bottom Plate from the 45° tilt sample and 60° tilt sample respectively of the same plate. The results from the XRD analysis of this work also showed a 74% and 151% increase of the peak intensity for the 0° tilt sample of the Middle Plate when compared to the 45° tilt sample and 60° tilt sample respectively of the same plate. Whereas results for this work showed a 54% and 41% decrease in peak intensity of the 0° tilt sample of the Top Plate from the 45° tilt sample and 60° tilt sample respectively of the same plate. Energy Dispersive X-ray Spectroscopy was also performed

  7. Microstructure and temperature coefficient of resistance of thin cermet resistor films deposited from CrSi{sub 2}-Cr-SiC targets by S-gun magnetron

    SciTech Connect

    Felmetsger, Valery V.

    2010-01-15

    Technological solutions for producing nanoscale cermet resistor films with sheet resistances above 1000 {Omega}/{open_square} and low temperature coefficients of resistance (TCR) have been investigated. 2-40 nm thick cermet films were sputter deposited from CrSi{sub 2}-Cr-SiC targets by a dual cathode dc S-gun magnetron. In addition to studying film resistance versus temperature, the nanofilm structural features and composition were analyzed using scanning electron microscopy, atomic force microscopy, high-resolution transmission electron microscopy, energy-dispersive x-ray spectroscopy, and electron energy loss spectroscopy. This study has revealed that all cermet resistor films deposited at ambient and elevated temperatures were amorphous. The atomic ratio of Si to Cr in these films was about 2 to 1. The film TCR displayed a significant increase when the deposited film thickness was reduced below 2.5 nm. An optimized sputter process consisting of wafer degassing, cermet film deposition at elevated temperature with rf substrate bias, and a double annealing in vacuum, consisting of in situ annealing following the film sputtering and an additional annealing following the exposure of the wafers to air, has been found to be very effective for the film thermal stabilization and for fine tuning the film TCR. Cermet films with thicknesses in the range of 2.5-4 nm deposited using this technique had sheet resistances ranging from 1800 to 1200 {Omega}/{open_square} and TCR values from -50 ppm/ deg. C to near zero, respectively. A possible mechanism responsible for the high efficiency of annealing the cermet films in vacuum (after preliminary exposure to air), resulting in resistance stabilization and TCR reduction, is also discussed.

  8. Dual-Doppler Feasibility Study

    NASA Technical Reports Server (NTRS)

    Huddleston, Lisa L.

    2012-01-01

    When two or more Doppler weather radar systems are monitoring the same region, the Doppler velocities can be combined to form a three-dimensional (3-D) wind vector field thus providing for a more intuitive analysis of the wind field. A real-time display of the 3-D winds can assist forecasters in predicting the onset of convection and severe weather. The data can also be used to initialize local numerical weather prediction models. Two operational Doppler Radar systems are in the vicinity of Kennedy Space Center (KSC) and Cape Canaveral Air Force Station (CCAFS); these systems are operated by the 45th Space Wing (45 SW) and the National Weather Service Melbourne, Fla. (NWS MLB). Dual-Doppler applications were considered by the 45 SW in choosing the site for the new radar. Accordingly, the 45th Weather Squadron (45 WS), NWS MLB and the National Aeronautics and Space Administration tasked the Applied Meteorology Unit (AMU) to investigate the feasibility of establishing dual-Doppler capability using the two existing systems. This study investigated technical, hardware, and software requirements necessary to enable the establishment of a dual-Doppler capability. Review of the available literature pertaining to the dual-Doppler technique and consultation with experts revealed that the physical locations and resulting beam crossing angles of the 45 SW and NWS MLB radars make them ideally suited for a dual-Doppler capability. The dual-Doppler equations were derived to facilitate complete understanding of dual-Doppler synthesis; to determine the technical information requirements; and to determine the components of wind velocity from the equation of continuity and radial velocity data collected by the two Doppler radars. Analysis confirmed the suitability of the existing systems to provide the desired capability. In addition, it is possible that both 45 SW radar data and Terminal Doppler Weather Radar data from Orlando International Airport could be used to alleviate any

  9. Dual of QCD with one adjoint fermion

    SciTech Connect

    Mojaza, Matin; Nardecchia, Marco; Pica, Claudio; Sannino, Francesco

    2011-03-15

    We construct the magnetic dual of QCD with one adjoint Weyl fermion. The dual is a consistent solution of the 't Hooft anomaly matching conditions, allows for flavor decoupling, and remarkably constitutes the first nonsupersymmetric dual valid for any number of colors. The dual allows to bound the anomalous dimension of the Dirac fermion mass operator to be less than one in the conformal window.

  10. Comparative analysis of electrophysical properties of ceramic tantalum pentoxide coatings, deposited by electron beam evaporation and magnetron sputtering methods

    NASA Astrophysics Data System (ADS)

    Donkov, N.; Mateev, E.; Safonov, V.; Zykova, A.; Yakovin, S.; Kolesnikov, D.; Sudzhanskaya, I.; Goncharov, I.; Georgieva, V.

    2014-12-01

    Ta2O5 ceramic coatings have been deposited on glass substrates by e-beam evaporation and magnetron sputtering methods. For the magnetron sputtering process Ta target was used. X-ray diffraction measurements show that these coatings are amorphous. XPS survey spectra of the ceramic Ta2O5 coatings were obtained. All spectra consist of well-defined XPS lines of Ta 4f, 4d, 4p and 4s; O 1s; C 1s. Ta 4f doublets are typical for Ta2O5 coatings with two main peaks. Scanning electron microscopy and atomic force microscopy images of the e-beam evaporated and magnetron sputtered Ta2O5 ceramic coatings have revealed a relatively flat surface with no cracks. The dielectric properties of the tantalum pentoxide coatings have been investigated in the frequency range of 100 Hz to 1 MHz. The electrical behaviour of e-beam evaporated and magnetron sputtered Ta2O5 ceramic coatings have also been compared. The deposition process conditions principally effect the structure parameters and electrical properties of Ta2O5 ceramic coatings. The coatings deposited by different methods demonstrate the range of dielectric parameters due to the structural and stoichiometric composition changes

  11. A cookbook for building a high-current dimpled H magnetron source for accelerators

    SciTech Connect

    Bollinger, Daniel S.; Karns, Patrick R.; Tan, Cheng -Yang

    2015-10-30

    A high-current (>50 mA) dimpled H magnetron source has been built at Fermilab for supplying H beam to the entire accelerator complex. Despite many decades of expertise with slit H magnetron sources at Fermilab, we were faced with many challenges from the dimpled H magnetron source, which needed to be overcome in order to make it operational. Dimpled H sources for high-energy physics are not new: Brookhaven National Laboratory has operated a dimpled H- source for more than two decades. However, the transference of that experience to Fermilab took about two years because a cookbook for building this type of source did not exist and seemingly innocuous or undocumented choices had a huge impact on the success or failure for this type of source. Moreover, it is the goal of this paper to document the reasons for these choices and to present a cookbook for building and operating dimpled H magnetron sources.

  12. Thin-film heterostructures based on oxides of copper and zinc obtained by RF magnetron sputtering in one vacuum cycle

    NASA Astrophysics Data System (ADS)

    Afanasjev, V.; Bazhan, M.; Klimenkov, B.; Mukhin, N.; Chigirev, D.

    2016-07-01

    Investigations of formation conditions of oxide heterostructures ZnO/CuO in the same vacuum cycle using RF magnetron sputtering of powder targets of zinc and copper oxides were carried out. The optical and electrical properties of the thin film structures were studied.

  13. Combined optical emission and resonant absorption diagnostics of an Ar-O2-Ce-reactive magnetron sputtering discharge

    NASA Astrophysics Data System (ADS)

    El Mel, A. A.; Ershov, S.; Britun, N.; Ricard, A.; Konstantinidis, S.; Snyders, R.

    2015-01-01

    We report the results on combined optical characterization of Ar-O2-Ce magnetron sputtering discharges by optical emission and resonant absorption spectroscopy. In this study, a DC magnetron sputtering system equipped with a movable planar magnetron source with a Ce target is used. The intensities of Ar, O, and Ce emission lines, as well as the absolute densities of Ar metastable and Ce ground state atoms are analyzed as a function of the distance from the magnetron target, applied DC power, O2 content, etc. The absolute number density of the Arm is found to decrease exponentially as a function of the target-to-substrate distance. The rate of this decrease is dependent on the sputtering regime, which should be due to the different collisional quenching rates of Arm by O2 molecules at different oxygen contents. Quantitatively, the absolute number density of Arm is found to be equal to ≈ 3 × 108 cm- 3 in the metallic, and ≈ 5 × 107 cm- 3 in the oxidized regime of sputtering, whereas Ce ground state densities at the similar conditions are found to be few times lower. The absolute densities of species are consistent with the corresponding deposition rates, which decrease sharply during the transition from metallic to poisoned sputtering regime.

  14. 7 CFR 247.19 - Dual participation.

    Code of Federal Regulations, 2014 CFR

    2014-01-01

    ... 7 Agriculture 4 2014-01-01 2014-01-01 false Dual participation. 247.19 Section 247.19 Agriculture... CHILD NUTRITION PROGRAMS COMMODITY SUPPLEMENTAL FOOD PROGRAM § 247.19 Dual participation. (a) What must State and local agencies do to prevent and detect dual participation? The State agency must work...

  15. 7 CFR 247.19 - Dual participation.

    Code of Federal Regulations, 2010 CFR

    2010-01-01

    ... 7 Agriculture 4 2010-01-01 2010-01-01 false Dual participation. 247.19 Section 247.19 Agriculture... CHILD NUTRITION PROGRAMS COMMODITY SUPPLEMENTAL FOOD PROGRAM § 247.19 Dual participation. (a) What must State and local agencies do to prevent and detect dual participation? The State agency must work...

  16. 7 CFR 247.19 - Dual participation.

    Code of Federal Regulations, 2013 CFR

    2013-01-01

    ... 7 Agriculture 4 2013-01-01 2013-01-01 false Dual participation. 247.19 Section 247.19 Agriculture... CHILD NUTRITION PROGRAMS COMMODITY SUPPLEMENTAL FOOD PROGRAM § 247.19 Dual participation. (a) What must State and local agencies do to prevent and detect dual participation? The State agency must work...

  17. 7 CFR 247.19 - Dual participation.

    Code of Federal Regulations, 2011 CFR

    2011-01-01

    ... 7 Agriculture 4 2011-01-01 2011-01-01 false Dual participation. 247.19 Section 247.19 Agriculture... CHILD NUTRITION PROGRAMS COMMODITY SUPPLEMENTAL FOOD PROGRAM § 247.19 Dual participation. (a) What must State and local agencies do to prevent and detect dual participation? The State agency must work...

  18. 7 CFR 247.19 - Dual participation.

    Code of Federal Regulations, 2012 CFR

    2012-01-01

    ... 7 Agriculture 4 2012-01-01 2012-01-01 false Dual participation. 247.19 Section 247.19 Agriculture... CHILD NUTRITION PROGRAMS COMMODITY SUPPLEMENTAL FOOD PROGRAM § 247.19 Dual participation. (a) What must State and local agencies do to prevent and detect dual participation? The State agency must work...

  19. Dual Enrollment in Spanish: One Working Model

    ERIC Educational Resources Information Center

    Bloom, Melanie; Chambers, Laura

    2009-01-01

    Dual enrollment is now a nation-wide phenomenon as all 50 states currently offer some form of dual-enrollment program to secondary-school students (Karp, Bailey, Hughes, and Fermin 2005). However, dual enrollment itself is often difficult to define as programs vary from school to school (Jordan, Cavalluzzo, and Corallo 2006). Therefore, language…

  20. Dual Enrollment for High School Students

    ERIC Educational Resources Information Center

    Edwards, Linsey; Hughes, Katherine

    2011-01-01

    Dual enrollment programs allow high school students to enroll in college courses and potentially earn college credit. The term concurrent enrollment is sometimes used interchangeably with dual enrollment, and sometimes to refer to a particular model of dual enrollment. In some programs, students earn high school and college credit simultaneously;…

  1. Tribological and mechanical properties of Ti/TiAlN/TiAlCN nanoscale multilayer PVD coatings deposited on AISI H11 hot work tool steel

    NASA Astrophysics Data System (ADS)

    AL-Bukhaiti, M. A.; Al-hatab, K. A.; Tillmann, W.; Hoffmann, F.; Sprute, T.

    2014-11-01

    A new [Ti/TiAlN/TiAlCN]5 multilayer coatings were deposited onto polished substrate AISI H11 (DIN 1.2343) steel by an industrial magnetron sputtering device. The tribological performance of the coated system was investigated by a ball-on-disk tribometer against 100Cr6 steel and Al2O3 balls. The friction coefficients and specific wear rates were measured at various normal loads (2, 5, 8, and 10 N) and sliding velocities (0.2, 0.4, and 0.8 m/s) in ambient air and dry conditions. The phase structure, composition, wear tracks morphologies, hardness, and film/substrate adhesion of the coatings were characterized by light-microscopy, scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), 3D-surface analyzer, nanoindentation, and scratch tests. Results showed that the deposited coatings showed low wear rates in the scale of 10-15 m3/N m, low friction coefficients against 100Cr6 and Al2O3 balls in the range of 0.25-0.37, and good hardness in the range of 17-20 GPa. Results also revealed that the friction coefficients and disc wear rates decrease and increase, respectively with the increase in normal load and sliding velocity for both coating/Al2O3 and coating/100Cr6 sliding system. Compared with the uncoated-H11 substrate, the deposited coating exhibited superior tribological and mechanical properties. The dominant wear mechanism was abrasive wear for coating/Al2O3 pair, while for coating/100Cr6 pair, a combination of mild adhesive wear, severe adhesive wear, and abrasive wear (extensive plowing) were the dominant wear mechanisms at different applied normal loads.

  2. Dual-Laser-Pulse Ignition

    NASA Technical Reports Server (NTRS)

    Trinh, Huu; Early, James W.; Thomas, Matthew E.; Bossard, John A.

    2006-01-01

    A dual-pulse laser (DPL) technique has been demonstrated for generating laser-induced sparks (LIS) to ignite fuels. The technique was originally intended to be applied to the ignition of rocket propellants, but may also be applicable to ignition in terrestrial settings in which electric igniters may not be suitable.

  3. Dual shell pressure balanced vessel

    DOEpatents

    Fassbender, Alexander G.

    1992-01-01

    A dual-wall pressure balanced vessel for processing high viscosity slurries at high temperatures and pressures having an outer pressure vessel and an inner vessel with an annular space between the vessels pressurized at a pressure slightly less than or equivalent to the pressure within the inner vessel.

  4. Dual numbers and supersymmetric mechanics

    NASA Astrophysics Data System (ADS)

    Frydryszak, Andrzej M.

    2005-11-01

    We show that dual numbers, apart from the known practical applications to the description of a rigid body movements in three dimensional space and natural presence in abstract differential algebra, play a role in field theory and are related to supersymmetry as well. Relevant models are considered.

  5. Dual function conducting polymer diodes

    DOEpatents

    Heeger, Alan J.; Yu, Gang

    1996-01-01

    Dual function diodes based on conjugated organic polymer active layers are disclosed. When positively biased the diodes function as light emitters. When negatively biased they are highly efficient photodiodes. Methods of preparation and use of these diodes in displays and input/output devices are also disclosed.

  6. Dual Processing and Diagnostic Errors

    ERIC Educational Resources Information Center

    Norman, Geoff

    2009-01-01

    In this paper, I review evidence from two theories in psychology relevant to diagnosis and diagnostic errors. "Dual Process" theories of thinking, frequently mentioned with respect to diagnostic error, propose that categorization decisions can be made with either a fast, unconscious, contextual process called System 1 or a slow, analytical,…

  7. Dual acting slit control mechanism

    NASA Technical Reports Server (NTRS)

    Struthoff, G. L. (Inventor)

    1980-01-01

    A dual acting control system for mass spectrometers is described, which permits adjustment of the collimating slit width and centering of the collimating slit while using only one vacuum penetration. Coaxial shafts, each with independent vacuum bellows are used to independently move the entire collimating assembly or to adjust the slit dimension through a parallelogram linkage.

  8. Dual wire weld feed proportioner

    NASA Technical Reports Server (NTRS)

    Nugent, R. E.

    1968-01-01

    Dual feed mechanism enables proportioning of two different weld feed wires during automated TIG welding to produce a weld alloy deposit of the desired composition. The wires are fed into the weld simultaneously. The relative feed rates of the wires and the wire diameters determine the weld deposit composition.

  9. Electrostatic quadrupole plasma mass spectrometer measurements during thin film depositions using simultaneous matrix assisted pulsed laser evaporation and magnetron sputtering

    SciTech Connect

    Hunter, C. N.; Check, M. H.; Muratore, C.; Voevodin, A. A.

    2010-05-15

    A hybrid plasma deposition process, combining matrix assisted pulsed laser evaporation (MAPLE) of carbon nanopearls (CNPs) with magnetron sputtering of gold was investigated for growth of composite films, where 100 nm sized CNPs were encapsulated into a gold matrix. Composition and morphology of such composite films was characterized with x-ray photoelectron spectroscopy, scanning electron microscopy, and transmission electron microscopy (TEM) analysis. Carbon deposits on a gold magnetron sputter target and carbon impurities in the gold matrices of deposited films were observed while codepositing from gold and frozen toluene-CNP MAPLE targets in pure argon. Electrostatic quadrupole plasma analysis was used to determine that a likely mechanism for generation of carbon impurities was a reaction between toluene vapor generated from the MAPLE target and the argon plasma originating from the magnetron sputtering process. Carbon impurities of codeposited films were significantly reduced by introducing argon-oxygen mixtures into the deposition chamber; reactive oxygen species such as O and O+ effectively removed carbon contamination of gold matrix during the codeposition processes. Increasing the oxygen to argon ratio decreased the magnetron target sputter rate, and hence hybrid process optimization to prevent gold matrix contamination and maintain a high sputter yield is needed. High resolution TEM with energy dispersive spectrometry elemental mapping was used to study carbon distribution throughout the gold matrix as well as embedded CNP clusters. This research has demonstrated that a hybrid MAPLE and magnetron sputtering codeposition process is a viable means for synthesis of composite thin films from premanufactured nanoscale constituents, and that cross-process contaminations can be overcome with understanding of hybrid plasma process interaction mechanisms.

  10. Dual nozzle aerodynamic and cooling analysis study

    NASA Technical Reports Server (NTRS)

    Meagher, G. M.

    1981-01-01

    Analytical models to predict performance and operating characteristics of dual nozzle concepts were developed and improved. Aerodynamic models are available to define flow characteristics and bleed requirements for both the dual throat and dual expander concepts. Advanced analytical techniques were utilized to provide quantitative estimates of the bleed flow, boundary layer, and shock effects within dual nozzle engines. Thermal analyses were performed to define cooling requirements for baseline configurations, and special studies of unique dual nozzle cooling problems defined feasible means of achieving adequate cooling.

  11. Renal applications of dual-energy CT.

    PubMed

    Kaza, Ravi K; Platt, Joel F

    2016-06-01

    Dual-energy CT is being increasingly used for abdominal imaging due to its incremental benefit of material characterization without significant increase in radiation dose. Knowledge of the different dual-energy CT acquisition techniques and image processing algorithms is essential to optimize imaging protocols and understand potential limitations while using dual-energy CT renal imaging such as urinary calculi characterization, assessment of renal masses and in CT urography. This review article provides an overview of the current dual-energy CT techniques and use of dual-energy CT in renal imaging. PMID:27010938

  12. Control over the preferred orientation of CIGS films deposited by magnetron sputtering using a wetting layer

    NASA Astrophysics Data System (ADS)

    Yan, Yong; Jiang, Fan; Liu, Lian; Yu, Zhou; Zhang, Yong; Zhao, Yong

    2016-01-01

    A growth method is presented to control the preferred orientation in chalcopyrite CuIn x Ga1- x Se2 (CIGS) thin films grown by magnetron sputtering. Films with (220/204) and (112) preferred orientation as well as randomly oriented films were prepared. The effects of an In2Se3 wetting layer and the working pressure on the texture transition phenomena were examined. A large-grained CIGS film with (220/204) texture was formed at 400°C with the inclusion of a thin (80 nm) In2Se3 layer and liquid phase (excess copper selenide phase) formation, and the reaction mechanism is proposed. The device deposited at 2.0 Pa on an In2Se3 layer exhibited the optimal electrical properties. [Figure not available: see fulltext.

  13. Experimental investigation of a relativistic magnetron with diffraction output on a repetitive short pulse generator

    SciTech Connect

    Li, Wei; Zhang, Jun; Zhang, Zi-cheng; Sun, Xiao-liang; Liu, Yong-gui

    2014-04-15

    An experimental investigation of a relativistic Magnetron with Diffraction Output (MDO) on a short voltage pulse generator, which has maximum repetition rate of 100 Hz and plateau of 2.5 ns, is detailed in this paper. Compared to the conversional solid cathode, a direct Density Modulation Cathode is capable for desired microwave radiation. When applied voltage is 200 kV and axial magnetic field is ∼0.12 T, the MDO radiates 120 MW of microwave with 2.3 GHz of central frequency. Power conversion efficiency reaches 22%. Pulse duration is 3 ns. At repetition rates of 50 Hz and 100 Hz, output microwave powers range from 90 MW to 120 MW. Life time is up to 10{sup 4} shots.

  14. Antireflection coatings for deep ultraviolet optics deposited by magnetron sputtering from Al targets.

    PubMed

    Liao, Bo-Huei; Lee, Cheng-Chung

    2011-04-11

    We introduce an innovative technique for the deposition of fluorine doped oxide (F:Al(2)O(3)) films by DC pulse magnetron sputtering from aluminum targets at room temperature. There was almost no change in transmittance even after the film was exposed to air for two weeks. Its refractive index was around 1.69 and the extinction coefficient was smaller than 1.9 × 10(-4) at 193 nm. An AlF(3)/F:Al(2)O(3) antireflection coating was deposited on both sides of a quartz substrate. A high transmittance of 99.32% was attained at the 193 nm wavelength. The cross-sectional morphology showed that the surface of the multilayer films was smooth and there were no columnar or porous structures. PMID:21503058

  15. Electrochromic properties of niobium oxide thin films prepared by DC magnetron sputtering

    SciTech Connect

    Yoshimura, Kazuki; Miki, Takeshi; Tanemura, Sakae

    1997-09-01

    Niobium oxide electrochromic thin films were prepared by reactive DC magnetron sputtering and their electrochromic properties for Li intercalation and durability were studied. Chronoamperometric analyses revealed that the extended space-charge limited model by Zhang et al. is applicable to Nb{sub 2}O{sub 5} films. Crystallized Nb{sub 2}O{sub 5} films showed excellent electrochromism and stability over many coloration-bleaching cycles. The best performance was obtained for films with a substrate temperature of 500 C and an oxygen flow rate of 10 sccm. Electrochromic materials enable dynamic control of the throughput of radiant energy, and play a significant role in energy-efficient smart windows in order to reduce the cooling and lighting costs of buildings.

  16. Mechanical property improvement by texture control of magnetron co-sputtered Zr-Ti films

    NASA Astrophysics Data System (ADS)

    Wang, Weipeng; Zhan, Peng; Xie, Zheng; Li, Zhengcao; Zhang, Zhengjun

    2014-01-01

    The present work studies the effect of substrate temperature and film composition on the structural and mechanical properties evolution of magnetron sputtered Zr-Ti films. As-deposited films show a monotonically strengthening (0002) crystallographic texture ranging from ambient temperature to 523 K, while then reveal a (0002) texture to randomly orientated structure transition at higher temperature. High Resolution TEM observations reveal a competitive and reconstruction growth mechanism which is in good agreement with the well-known Structure Zone Model. Nano-indentation measurements revealed that texture strengthening contribute to the improvement of mechanical properties. These results suggest that by establishing a semi-quantitative phase diagram based on the Structure Zone Model, structure and structure-related properties modification can be easily realized and precisely controlled by modifying the TS/Tm region during deposition.

  17. Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

    PubMed

    Majeed, Asif; He, Jie; Jiao, Lingrui; Zhong, Xiaoxia; Sheng, Zhengming

    2015-01-01

    Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed. PMID:25852353

  18. Particle visualization in high-power impulse magnetron sputtering. I. 2D density mapping

    SciTech Connect

    Britun, Nikolay Palmucci, Maria; Konstantinidis, Stephanos; Snyders, Rony

    2015-04-28

    Time-resolved characterization of an Ar-Ti high-power impulse magnetron sputtering discharge has been performed. This paper deals with two-dimensional density mapping in the discharge volume obtained by laser-induced fluorescence imaging. The time-resolved density evolution of Ti neutrals, singly ionized Ti atoms (Ti{sup +}), and Ar metastable atoms (Ar{sup met}) in the area above the sputtered cathode is mapped for the first time in this type of discharges. The energetic characteristics of the discharge species are additionally studied by Doppler-shift laser-induced fluorescence imaging. The questions related to the propagation of both the neutral and ionized discharge particles, as well as to their spatial density distributions, are discussed.

  19. Electrochemical properties of magnetron sputtered WO{sub 3} thin films

    SciTech Connect

    Madhavi, V.; Kondaiah, P.; Hussain, O. M.; Uthanna, S.

    2013-02-05

    Thin films of tungsten oxide (WO{sub 3}) were deposited on ITO substrates by using RF magnetron sputtering at oxygen and argon atmospheres of 6 Multiplication-Sign 10{sup -2}Pa and 4 Pa respectively. The chemical composition and surface morphology of the WO{sub 3} thin films have been studied by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) respectively. The results indicate that the deposited WO{sub 3} thin films are nearly stoichiometric. The electrochemical performances of the WO{sub 3} thin films have been evaluated by galvonostatic charging/discharging method. The discharge capacity was 15{mu}Ah/cm{sup 2}{mu}m at the initial cycle and faded rapidly in the first few cycles and stabilized at a lesser stage.

  20. Characteristics of W Doped Nanocrystalline Carbon Films Prepared by Unbalanced Magnetron Sputtering.

    PubMed

    Park, Yong Seob; Park, Chul Min; Kim, Nam-Hoon; Kim, Jae-Moon

    2016-05-01

    Nanocrystalline tungsten doped carbon (WC) films were prepared by unbalanced magnetron sputtering. Tungsten was used as the doping material in carbon thin films with the aim of application as a contact strip in an electric railway. The structural, physical, and electrical properties of the fabricated WC films with various DC bias voltages were investigated. The films had a uniform and smooth surface. Hardness and frication characteristics of the films were improved, and the resistivity and sheet resistance decreased with increasing negative DC bias voltage. These results are associated with the nanocrystalline WC phase and sp(2) clusters in carbon networks increased by ion bombardment enhanced with increasing DC bias voltage. Consequently, the increase of sp(2) clusters containing WC nanocrystalline in the carbon films is attributed to the improvement in the physical and electrical properties. PMID:27483857

  1. Studies on optoelectronic properties of DC reactive magnetron sputtered chromium doped CdO thin films

    SciTech Connect

    Hymavathi, B. Rao, T. Subba; Kumar, B. Rajesh

    2014-10-15

    Cr doped CdO thin films were deposited on glass substrates by DC reactive magnetron sputtering method and subsequently annealed from 200 °C to 500 °C. X-ray diffraction analysis showed that the films exhibit (1 1 1) preferred orientation. The optical transmittance of the films increases from 64% to 88% with increasing annealing temperature. The optical band gap values were found to be decreased from 2.77 to 2.65 eV with the increase of annealing temperature. The decrease in optical band gap energy with increasing annealing temperature can be attributed to improvement in the crystallinity of the films and may also be due to quantum confinement effect. A minimum resistivity of 2.23 × 10{sup −4} Ω.cm and sheet resistance of 6.3 Ω/sq is obtained for Cr doped CdO film annealed at 500 °C.

  2. Electrical and structural properties of zirconia thin films prepared by reactive magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Hembram, K. P. S. S.; Dutta, Gargi; Waghmare, Umesh V.; Mohan Rao, G.

    2007-10-01

    Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comparable to the average grain size of the thin film which is about 6 nm obtained from X-ray diffraction. The film annealed at 873 K exhibits an optical band gap of around 4.83 eV and shows +4 oxidation state of zirconium indicating fully oxidized zirconium, whereas higher annealing temperatures lead to oxygen deficiency in the films and this is reflected in their properties. A discontinuity in the imaginary part of the AC conductivity was observed in the frequency range of tens of thousands of Hz, where as, the real part does not show such behavior.

  3. Effects of parameters on the performance of amorphous IGZO thin films prepared by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Niu, Jian-wen; Ma, Rui-xin; Wang, Yuan-yuan; Li, Shi-na; Cheng, Shi-yao; Liu, Zi-lin

    2014-09-01

    Amorphous indium-gallium-zinc oxide (IGZO) transparent conductive thin films are prepared on glass substrates by radio frequency (RF) magnetron sputtering. The effects of seven factors, which are substrate temperature, sputtering atmosphere, working pressure, sputtering power, annealing temperature, negative bias voltage and sputtering time, on Hall mobility, transmittance and surface roughness are studied through orthogonal experiments. The results show that the effects of working pressure, substrate temperature and sputtering atmosphere on performance of films are the most prominent. According to the experimental results and discussion, relatively reasonable process parameters are obtained, which are working pressure of 0.35 Pa, substrate temperature of 200 °C, sputtering atmosphere of Ar, sputtering power of 125 W, sputtering time of 30 min, negative bias voltage of 0 V and annealing temperature of 300 °C.

  4. Size-dependent electrical conductivity of indium zinc oxide deposited by RF magnetron sputtering.

    PubMed

    Heo, Young-Woo; Pearton, S J; Norton, D P

    2012-04-01

    We investigated the size-dependent electrical conductivities of indium zinc oxide stripes with different widths from 50 nm to 4 microm and with the same thickness of 50 nm deposited by RF magnetron sputtering. The size of the indium zinc oxide stripes was controlled by e-beam lithography. The distance of the two Ti/Au Ohmic electrodes along the indium zinc oxide stripes was kept constant at 25 microm. The electrical conductivity decreased as the size of the indium zinc oxide stripes decreased below a critical width (80 nm). The activation energy, derived from the electric conductivity versus temperature measurement, was dependent on the dimensions of indium zinc oxide stripes. These results can be understood as stemming from surface charge trapping from the absorption of oxygen and/or water vapor, which leads to an increase in the energy difference between the conduction energy band and the Fermi energy. PMID:22849102

  5. A Complementary Type of Electrochromic Device by Radio Frequency Magnetron Sputtering System

    NASA Astrophysics Data System (ADS)

    Oksuz, Lutfi; Kiristi, Melek; Bozduman, Ferhat; Uygun Oksuz, Aysegul

    2014-10-01

    Electrochromic (EC) devices can change their optical properties reversibly in the visible region (400-800 nm) upon charge insertion/extraction reactions according to the applied voltage. A complementary type of EC device composes of two electrochromic layers, which is separated by an ionic conduction layer (electrolyte). In this work, the EC device was fabricated using vanadium oxide (V2O5) and titanium doped tungsten oxide (WO3-TiO2) electrodes. The EC electrodes were deposited as thin film structures by a reactive RF magnetron sputtering system in a medium of gas mixture of argon and oxygen. surface morphology of the films was characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Electrochemical property and durability of the EC device was investigated by a potentiostat system. Optical measurement was examined under applied voltages of +/- 2.5 V by a computer-controlled system, constantly.

  6. Deposition of a conductive near-infrared cutoff filter by radio-frequency magnetron sputtering.

    PubMed

    Lee, Jang-Hoon; Lee, Seung-Hyu; Yoo, Kwang-Lim; Kim, Nam-Young; Hwangbo, Chang Kwon

    2002-06-01

    We have designed a conductive near-infrared (NIR) cutoff filter for display application, i.e., a modified low-emissivity filter based on the three periods of the basic design of [TiO2[Ti]Ag] TiO2] upon a glass substrate and investigated the optical, structural, chemical, and electrical properties of the conductive NIR cutoff filter prepared by a radio frequency magnetron sputtering system. The results show that the average transmittance is 61.1% in the visible, that the transmittance in the NIR is less than 6.6%, and that the sheet resistance and emissivity are 0.9 ohms/square (where square stands for a square film) and 0.012, respectively, suggesting that the conductive NIR cutoff filter can be employed as a shield against the hazard of electromagnetic waves as well as to cut off the NIR. PMID:12064381

  7. Photocatalytic activity of nanosized TiO2 thin film prepared by magnetron sputtering method.

    PubMed

    Kang, Sang-Jun; Kim, Ki-Joong; Chung, Min-Chul; Jung, Sang-Chul; Boo, Su-Il; Cho, Soon Kye; Jeong, Woon-Jo; Ahn, Ho-Geun

    2011-02-01

    Nanosized TiO2 thin film on the substrate such as stainless steel plate and slide glass film were prepared by magnetron sputtering method, and these TiO2 thin films were characterized by field emission-scanning electron microscopy (FE-SEM). Photocatalytic activity for Methyl-ethyl-ketone (MEK) and acetaldehyde were measured using a closed circulating reaction system through the various ultra violet (UV) sources. From the results of SEM images, nanosized TiO2 thin film was uniformly coated on slide glass, ranging from 360 nm to 370 nm. Photocatalytic activity of MEK over TiO2 thin film on stainless steel plate did not occur by UV-A irradiation, but was efficiently decomposed by UV-B and UV-C. Also, acetaldehyde could be decomposed than MEK. The effect of sputtering conditions on their structure and photocatalytic activities were investigated in detail. PMID:21456269

  8. Nanoporous Ti-metal film deposition using radio frequency magnetron sputtering technique for photovoltaic application.

    PubMed

    Sung, Youl-Moon; Paeng, Sung-Hwan; Moon, Byung-Ho; Kwak, Dong-Joo

    2012-02-01

    Nanoporous Ti-metal film electrode was fabricated by radio frequency (rf) magnetron sputtering technique on nanoporous TiO2 layer prepared by sol-gel combustion method and investigated with respect to its photo-anode properties of TCO-less DSCs. The porous Ti layer (approximately 1 microm) with low sheet resistance (approximately 17 Omega/sq.) can collect electrons from the TiO2 layer and allows the ionic diffusion of I(-)/I(3-) through the hole. The porous Ti layer with highly ordered columnar structure prepared by 8 mTorr sputtering shows the good impedance characteristics. The efficiency of prepared TCO-less DSCs sample is about 4.83% (ff: 0.6, Voc: 0.65 V, Jsc: 11.2 mA/cm2). PMID:22629960

  9. Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Rafieian, Damon; Ogieglo, Wojciech; Savenije, Tom; Lammertink, Rob G. H.

    2015-09-01

    We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to anatase or rutile, depending on the initial sputtering conditions. Substoichiometric films (TiOx<2), obtained by sputtering at relatively low oxygen concentration, formed rutile upon annealing in air, whereas stoichiometric films formed anatase. This route therefore presents a formation route for rutile films via lower (<500 °C) temperature pathways. The dynamics of the annealing process were followed by in situ ellipsometry, showing the optical properties transformation. The final crystal structures were identified by XRD. The anatase film obtained by this deposition method displayed high carriers mobility as measured by time-resolved microwave conductance. This also confirms the high photocatalytic activity of the anatase films.

  10. Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Majeed, Asif; He, Jie; Jiao, Lingrui; Zhong, Xiaoxia; Sheng, Zhengming

    2015-02-01

    Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

  11. Hydroxyapatite coatings on nanotubular titanium dioxide thin films prepared by radio frequency magnetron sputtering.

    PubMed

    Shin, Jinho; Lee, Kwangmin; Koh, Jeongtae; Son, Hyeju; Kim, Hyunseung; Lim, Hyun-Pil; Yun, Kwidug; Oh, Gyejeong; Lee, Seokwoo; Oh, Heekyun; Lee, Kyungku; Hwang, Gabwoon; Park, Sang-Won

    2013-08-01

    In this study, hydroxyapatite (HA) was coated on anodized titanium (Ti) surfaces through radio frequency magnetron sputtering in order to improve biological response of the titanium surface. All the samples were blasted with resorbable blasting media (RBM). RBM-blasted Ti surface, anodized Ti surface, as-sputtered HA coating on the anodized Ti surface, and heat-treated HA coating on the anodized Ti surface were prepared. The samples were characterized using scanning electron microscopy and X-ray photoemission spectroscopy, and biologic responses were evaluated. The top of the TiO2 nanotubes was not closed by HA particles when the coating time is less than 15 minutes. It was demonstrated that the heat-treated HA was well-crystallized and this enhanced the cell attachment of the anodized Ti surface. PMID:23882839

  12. Dielectric properties of tetragonal tungsten bronze films deposited by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Bodeux, Romain; Michau, Dominique; Josse, Michaël; Maglione, Mario

    2014-12-01

    Tetragonal tungsten bronze (TTB) films have been synthesised on Pt(111)/TiO2/SiO2/Si substrates from Ba2LnFeNb4O15 ceramics (Ln = La, Nd, Eu) by RF magnetron sputtering. X-ray diffraction measurements evidenced the multi-oriented nature of films with some degrees of preferential orientation along (111). The dependence of the dielectric properties on temperature and frequency has been investigated. The dielectric properties of the films are similar to those of the bulk, i.e., ɛ ˜150 and σ ˜10-6 Ω-1 cm-1 at 1 MHz and room temperature. The films exhibit two dielectric anomalies which are attributed to Maxwell Wagner polarization mechanism and relaxor behaviour. Both anomalies are sensitive to post-annealing under oxygen atmosphere and their activation energies are similar Ea ˜0.30 eV. They are explained in terms of electrically heterogeneous contributions in the films.

  13. Obtaining Au thin films in atmosphere of reactive nitrogen through magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Quintero, J. H.; Ospina, R.; Mello, A.

    2016-02-01

    4d and 5d series of the transition metals are used to the obtaining nitrides metallic, due to the synthesis of PtN, AgN and AuN in the last years. Different nitrides are obtained in the Plasma Assisted Physics Vapour Deposition system, due to its ionization energy which is necessary for their formation. In this paper a Magnetron Sputtering system was used to obtain Au thin films on Si wafers in Nitrogen atmosphere. The substrate temperature was varied between 500 to 950°C. The samples obtained at high temperatures (>500°C) show Au, Si and N elements, as it is corroborated in the narrow spectrum obtained for X-Ray Photoelectron Spectroscopy; besides the competition of orientation crystallographic texture between (111) and (311) directions was present in the X-Ray Diffraction analysis to the sample heated at 950°C.

  14. Transparent conducting indium doped ZnO films by dc reactive S-gun magnetron sputtering.

    PubMed

    Ye, Z Z; Tang, J F

    1989-07-15

    Transparent conducting ZnO films have been prepared by modified S-gun reactive dc magnetron sputtering using an indium doped Zn target. Films with a resistivity of 1.08 x 10(-3) Omega cm and average transmittance of over 80% in the visible region were obtained. The influence of indium content at the surface of Zn target on the resistivity and transmittance of ZnO films was investigated. Optical properties of ZnO films in the 0.2-2.5-microm range were modeled by the Drude theory of free electrons. The reflectance of ZnO films in the 2.5-26.0-microm region was calculated. PMID:20555606

  15. Relativistic performance analysis of a high current density magnetron injection gun

    SciTech Connect

    Barnett, L. R.; Luhmann, N. C. Jr.; Chiu, C. C.; Chu, K. R.

    2009-09-15

    Electron beam quality is essential to the performance of millimeter-wave gyroamplifiers, particularly the gyrotron traveling-wave tube amplifier, which is extremely sensitive to the electron velocity spread and emission uniformity. As one moves up in power and frequency, the quality of the electron beam becomes even more critical. One aspect of the electron beam formation technology which has received relatively little attention has been the performance analysis of the electron beam itself. In this study, a 100 kV, 8 A magnetron injection gun with a calculated perpendicular-to-parallel velocity ratio of 1.4 and axial velocity spread of 3.5% has been designed, tested, and analyzed. It is shown that the equipment precision and a fully relativistic data analysis model afford sufficient resolution to allow a verification of the theoretical predictions as well as a quantitative inference to the surface roughness of the cathode used.

  16. Relativistic performance analysis of a high current density magnetron injection gun

    NASA Astrophysics Data System (ADS)

    Barnett, L. R.; Luhmann, N. C.; Chiu, C. C.; Chu, K. R.

    2009-09-01

    Electron beam quality is essential to the performance of millimeter-wave gyroamplifiers, particularly the gyrotron traveling-wave tube amplifier, which is extremely sensitive to the electron velocity spread and emission uniformity. As one moves up in power and frequency, the quality of the electron beam becomes even more critical. One aspect of the electron beam formation technology which has received relatively little attention has been the performance analysis of the electron beam itself. In this study, a 100 kV, 8 A magnetron injection gun with a calculated perpendicular-to-parallel velocity ratio of 1.4 and axial velocity spread of 3.5% has been designed, tested, and analyzed. It is shown that the equipment precision and a fully relativistic data analysis model afford sufficient resolution to allow a verification of the theoretical predictions as well as a quantitative inference to the surface roughness of the cathode used.

  17. Magnetron injection gun for a broadband gyrotron backward-wave oscillator

    SciTech Connect

    Yuan, C. P.; Chang, T. H.; Chen, N. C.; Yeh, Y. S.

    2009-07-15

    The magnetron injection gun is capable of generating relativistic electron beam with high velocity ratio and low velocity spread for a gyrotron backward-wave oscillator (gyro-BWO). However, the velocity ratio ({alpha}) varies drastically against both the magnetic field and the beam voltage, which significantly limits the tuning bandwidth of a gyro-BWO. This study remedies this drawback by adding a variable trim field to adjust the magnetic compression ratio when changing the operating conditions. Theoretical results obtained by employing a two-dimensional electron gun code (EGUN) demonstrate a constant velocity ratio of 1.5 with a low axial velocity spread of 6% from 3.4-4.8 Tesla. These results are compared with a three-dimensional particle-tracing code (computer simulation technology, CST). The underlying physics for constant {alpha} will be discussed in depth.

  18. Numerical Simulation of a Double-anode Magnetron Injection Gun for 110 GHz, 1 MW Gyrotron

    NASA Astrophysics Data System (ADS)

    Singh, Udaybir; Kumar, Nitin; Purohit, L. P.; Sinha, Ashok K.

    2010-07-01

    A 40 A double-anode magnetron injection gun for a 1 MW, 110 GHz gyrotron has been designed. The preliminary design has been obtained by using some trade-off equations. The electron beam analysis has been performed by using the commercially available code EGUN and the in-house developed code MIGANS. The operating mode of the gyrotron is TE22,6 and it is operated in the fundamental harmonic. The electron beam with a low transverse velocity spread ( δ {β_{ bot max }} = 2.26% ) and the transverse-to-axial velocity ratio of the electron beam (α) = 1.37 is obtained. The simulated results of the MIG obtained with the EGUN code have been validated with another trajectory code TRAK. The results on the design output parameters obtained by both the codes are in good agreement. The sensitivity analysis has been carried out by changing the different gun parameters to decide the fabrication tolerance.

  19. Secondary emission magnetron injection gun as high current durable electron source

    SciTech Connect

    Cherenshchikov, S.A.; Opanassenko, A.N.; Dovbnya, A.N.; Zakutin, V.V.

    1995-07-05

    Peculiarities of operation of secondary electron emission cathodes and different types of their excitation are discussed. On the base of available experimental data possibilities are analyzed for obtaining maximum achievable beam currents and densities. It is shown that the cross-field geometry is best-suited for achieving the highest current densities and peak beam currents. Experimental observables as regards beam characteristics of the secondary-emission magnetron gun (SEMIG) are presented. Prospects for obtaining beam current densities in excess of 100 A/cm{sup 2} at beam current above 100 A are discussed for cathode life times 20 to 100 thousand hours. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  20. Design of a double-anode magnetron-injection gun for the W-band gyrotron

    NASA Astrophysics Data System (ADS)

    Jang, Kwang Ho; Choi, Jin Joo; So, Joon Ho

    2015-07-01

    A double-anode magnetron-injection gun (MIG) was designed. The MIG is for a W-band 10-kW gyrotron. Analytic equations based on adiabatic theory and angular momentum conservation were used to examine the initial design parameters such as the cathode angle, and the radius of the beam emitting surface. The MIG's performances were predicted by using an electron trajectory code, the EGUN code. The beam spread of the axial velocity, Δvz/vz, obtained from the EGUN code was observed to be 1.34% at α = 1.3. The cathode edge emission and the thermal effect were modeled. The cathode edge emission was found to have a major effect on the velocity spread. The electron beam's quality was significantly improved by affixing non-emissive cylinders to the cathode.

  1. Effect of surface treatment on adhesion strength between magnetron sputtered copper thin films and alumina substrate

    NASA Astrophysics Data System (ADS)

    Lim, Ju Dy; Lee, Pui Mun; Rhee, Daniel Min Woo; Leong, Kam Chew; Chen, Zhong

    2015-11-01

    A number of surface pre-treatments have been studied for their effectiveness on the adhesion strength between magnetron sputtered copper (Cu) thin film and polycrystalline alumina (Al2O3) substrate. The treatments include organic solvent cleaning, acid washing, heat treatment, plasma cleaning, and they were organized into different sequences in order to evaluate their individual contribution to the film adhesion. Adhesion strength was measured mechanically using a pull test. By proper pre-treatment, the adhesive strength of at least 34 MPa can be achieved with direct sputtering of Cu thin film onto the Al2O3 substrate. With the help of XPS, SEM, XRD, TGA and contact angle measurement, the effect of the different substrate surface treatment techniques has been elucidated.

  2. A new solid state extractor pulser for the FNAL magnetron ion source

    SciTech Connect

    Bollinger, D. S.; Lackey, J.; Larson, J.; Triplett, K.

    2015-10-05

    A new solid state extractor pulser has been installed on the Fermi National Accelerator Laboratory (FNAL) magnetron ion source, replacing a vacuum tube style pulser that was used for over 40 years. The required ion source extraction voltage is 35 kV for injection into the radio frequency quadrupole. At this voltage, the old pulser had a rise time of over 150 μs due to the current limit of the vacuum tube. The new solid state pulsers are capable of 50 kV, 100 A peak current pulses and have a rise time of 9 μs when installed in the operational system. This paper will discuss the pulser design and operational experience to date.

  3. Fabrication of LiCoO{sub 2} thin film cathodes by DC magnetron sputtering method

    SciTech Connect

    Noh, Jung-pil; Cho, Gyu-bong; Jung, Ki-taek; Kang, Won-gyeong; Ha, Chung-wan; Ahn, Hyo-jun; Ahn, Jou-Hyeon; Nam, Tae-hyun; Kim, Ki-won

    2012-10-15

    LiCoO{sub 2} thin films were fabricated on Al substrate by direct current magnetron sputtering method. The effects of Ar/O{sub 2} gas rates and annealing temperatures were investigated. Crystal structures and surface morphologies of the deposited films were investigated by X-ray diffraction, Raman scattering spectroscopy and field emission scanning electron microscopy. The as-deposited LiCoO{sub 2} thin films exhibited amorphous structure. The crystallization starts at the annealing temperature over 400 °C. However, the annealed films have the partially disordered structure without completely ordered crystalline structure even at 600 °C annealing. The electrochemical properties of the LiCoO{sub 2} films were investigated by the charge–discharge and cycle measurements. The 500 °C annealing film has the highest capacity retention rate of 78.2% at 100th cycles.

  4. Microstructure and properties of SiC-coated carbon fibers prepared by radio frequency magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Cheng, Yong; Huang, Xiaozhong; Du, Zuojuan; Xiao, Jianrong; Zhou, Shan; Wei, Yongshan

    2016-04-01

    SiC-coated carbon fibers are prepared at room temperature with different radio-frequency magnetron sputtering powers. Results show that the coated carbon fibers have uniform, continuous, and flawless surfaces. The mean strengths of the coated carbon fibers with different sputtering powers are not influenced by other factors. Filament strength of SiC-coated carbon fibers increases by approximately 2% compared with that of uncoated carbon fibers at a sputtering power of <200 W. The filament strengths of the coated fibers increase by 9.3% and 12% at sputtering powers of 250 and 300 W, respectively. However, the mean strength of the SiC-coated carbon fibers decreased by 8% at a sputtering power of 400 W.

  5. Optical properties of ITO films obtained by high-frequency magnetron sputtering with accompanying ion treatment

    SciTech Connect

    Krylov, P. N. Zakirova, R. M.; Fedotova, I. V.

    2013-10-15

    A variation in the properties of indium-tin-oxide (ITO) films obtained by the method of reactive magnetron sputtering with simultaneous ion treatment is reported. The ITO films feature the following parameters in the optical range of 450-1100 nm: a transmission coefficient of 80%, band gap of 3.50-3.60 eV, and a refractive index of 1.97-2.06. All characteristics of the films depend on the ion-treatment current. The latter, during the course of deposition, reduces the resistivity of the ITO films with the smallest value of the resistivity being equal to 2 Multiplication-Sign 10{sup -3} {Omega} cm. The degradation of films with a high resistivity when kept in air is observed.

  6. Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Ming-Wei, Gao; Chao, Ye; Xiang-Ying, Wang; Yi-Song, He; Jia-Min, Guo; Pei-Fang, Yang

    2016-07-01

    Growth and structural properties of thin a-C films prepared by the 60 MHz very-high-frequency (VHF) magnetron sputtering were investigated. The energy and flux of ions impinging the substrate were also analyzed. It is found that the thin a-C films prepared by the 60 MHz sputtering have a lower growth rate, a smooth surface, and more sp3 contents. These features are related to the higher ion energy and the lower ions flux onto the substrate. Therefore, the 60 MHz VHF sputtering is more suitable for the preparation of thin a-C film with more sp3 contents. Project supported by the National Natural Science Foundation of China (Grant No. 11275136).

  7. Effect of sputtering power on the growth of Ru films deposited by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Jhanwar, Prachi; Kumar, Arvind; Verma, Seema; Rangra, K. J.

    2016-04-01

    Ruthenium is deposited by DC magnetron sputtering at different powers and is characterized. The effect of sputtering power on the electrical and structural properties of the film is investigated experimentally. High resolution X-ray diffraction is used to characterize the microstructure of Ru films deposited on SiO2 surface. The peak (002) is more sharp and intense with full width at half maximum (FWHM) of 0.37° at 250W. The grain size increases with increase in sputtering power improving the crystallinity of the film. The film deposited at high sputtering power also showed lower resistivity (12.40 µΩ-cm) and higher mobility (4.82 cm2/V.s) as compared to the film deposited at low power. The surface morphology of the film is studied by atomic force microscopy (AFM).

  8. Investigation on low thermal emittance of Al films deposited by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Ning, Yuping; Wang, Wenwen; Sun, Ying; Wu, Yongxin; Liu, Yingfang; Man, Hongliang; Wang, Cong; Zhang, Yong; Zhao, Shuxi; Tomasella, Eric; Bousquet, Angélique

    2016-03-01

    A series of Al films with different thicknesses were deposited on polished stainless steel by direct current (DC) magnetron sputtering as a metal IR-reflector layer in solar selective absorbing coating (SSAC). The effects of the film thickness and the temperature on the thermal emittance of the Al films are studied. An optimal thickness 78 nm of the Al film for the lowest total thermal emittance is obtained. The thermal emittance of the optimal Al film keeps close to 0.02 from 25 °C to 400 °C, which are low enough to satisfy the optical requirements in SSAC. The optical constants of the Al film are deduced by fitting the reflectance and transmission spectra using SCOUT software.

  9. Preparation and characterization of high-transmittance AZO films using RF magnetron sputtering at room temperature

    NASA Astrophysics Data System (ADS)

    Chen, Jian; Sun, Yihua; Lv, Xin; Li, Derong; Fang, Liang; Wang, Hailin; Sun, Xiaohua; Huang, Caihua; Yu, Haizhou; Feng, Ping

    2014-10-01

    Aluminum-doped zinc oxide (AZO) thin films with 250 nm thickness had been prepared on soda-lime glass substrate without heated by RF magnetron sputtering using a ceramic target. The microstructure, surface morphology, electrical and optical properties of AZO thin films had been investigated by X-ray diffraction, scanning electron microscope, four-point probe method and optical transmission spectroscopy. The results indicated that all of the films obtained were polycrystalline with a hexagonal structure and oriented with the c-axis perpendicular to the substrate. The resistivity decreased and transmittance improved with the sputtering power increase. The minimum resistivity of 2.55 × 10-3 Ω cm combined with highest transmittance of 91% was obtained at a sputtering power of 400 W. The optical bandgap at different sputtering power varied among 3.81-4.04 eV.

  10. A new solid state extractor pulser for the FNAL magnetron ion source

    NASA Astrophysics Data System (ADS)

    Bollinger, D. S.; Lackey, J.; Larson, J.; Triplett, K.

    2016-02-01

    A new solid state extractor pulser has been installed on the Fermi National Accelerator Laboratory (FNAL) magnetron ion source, replacing a vacuum tube style pulser that was used for over 40 years. The required ion source extraction voltage is 35 kV for injection into the radio frequency quadrupole. At this voltage, the old pulser had a rise time of over 150 μs due to the current limit of the vacuum tube. The new solid state pulsers are capable of 50 kV, 100 A peak current pulses and have a rise time of 9 μs when installed in the operational system. This paper will discuss the pulser design and operational experience to date.

  11. Influence of the microstructure on the corrosion behavior of magnetron sputter-quenched amorphous metallic alloys

    NASA Technical Reports Server (NTRS)

    Thakoor, A. P.; Khanna, S. K.; Williams, R. M.; Landel, R. F.

    1983-01-01

    The microstructure and corrosion behavior of magnetron sputter deposited amorphous metallic films of (Mo6ORu40)82B18 under varying sputtering atmospheres have been investigated. The microstructural details and topology of the films have been studied by scanning electron microscopy and correlated with the deposition conditions. By reducing the pressure of pure argon gas, the characteristic features of rough surface and columnar growth full of vertical voids can be converted into a mirror-smooth finish with very dense deposits. Films deposited in the presence of O2 or N2 exhibit columnar structure with vertical voids. Film deposited in pure argon at low pressure show remarkably high corrosion resistance due to the formation of a uniform passive surface layer. The influence of the microstructure and surface texture on the corrosion behavior is discussed.

  12. Characterization of ion beam and magnetron sputtered thin Ta/NiFe films

    NASA Astrophysics Data System (ADS)

    Mao, M.; Leng, Q.; Huai, Y.; Johnson, P.; Miller, M.; Tong, H.-C.; Miloslavsky, L.; Qian, C.; Wang, J.; Hegde, H.

    1999-04-01

    Thin Ta/NiFe films were deposited using ion beam deposition (IBD), pulsed, and static magnetron sputtering techniques. These NiFe films show anisotropy field values ˜4 Oe, easy axis coercivities ⩽1 Oe, and hard axis coercivities ⩽0.3 Oe. IBD films exhibit higher magnetoresistance ratios (ΔR/R), while little difference is noted between different deposition techniques in the sheet resistance of NiFe films. A ΔR/R value of 1.8% has been measured for a 90 Å IBD NiFe films. X-ray diffraction measurements indicate that NiFe films of the same thickness have about the same grain size regardless of deposition technique, however, IBD films exhibit superior (111) texture and crystallinity. Our results clearly indicate that the superior magnetic properties of thin IBD Ta/NiFe films are a result of high crystallographic quality of these films.

  13. Research on titanium nitride thin films deposited by reactive magnetron sputtering for MEMS applications

    NASA Astrophysics Data System (ADS)

    Merie, Violeta; Pustan, Marius; Negrea, Gavril; Bîrleanu, Corina

    2015-12-01

    Titanium nitride can be used among other materials as diffusion barrier for MEMS (microelectromechanical systems) applications. The aim of this study is to elaborate and to characterize at nanoscale titanium nitride thin films. The thin films were deposited by reactive magnetron sputtering on silicon substrates using a 99.99% purity titanium target. Different deposition parameters were employed. The deposition temperature, deposition time, substrate bias voltage and the presence/absence of a titanium buffer layer are the parameters that were modified. The so-obtained films were then investigated by atomic force microscopy. A significant impact of the deposition parameters on the determined mechanical and tribological characteristics was highlighted. The results showed that the titanium nitride thin films deposited for 20 min at room temperature without the presence of a titanium buffer layer when a negative bias of -90 V was applied to the substrate is characterized by the best tribological and mechanical behavior.

  14. Compression and strong rarefaction in high power impulse magnetron sputtering discharges

    SciTech Connect

    Horwat, David; Anders, Andre

    2010-11-11

    Gas compression and strong rarefaction have been observed for high power impulse magnetron sputtering (HIPIMS) discharges using a copper target in argon. Time-resolved ion saturation currents of 35 probes were simultaneously recorded for HIPIMS discharges operating far above the self-sputtering runaway threshold. The argon background pressure was a parameter for the evaluation of the spatial and temporal development of the plasma density distribution. The data can be interpreted by a massive onset of the sputtering flux (sputter wind) that causes a transient densification of the gas, followed by rarefaction and the replacement of gas plasma by the metal plasma of sustained self-sputtering. The plasma density pulse follows closely the power pulse at low pressure. At high pressure, the relatively remote probes recorded a density peak only after the discharge pulse, indicative for slow, diffusive ion transport.

  15. One-step aluminium-assisted crystallization of Ge epitaxy on Si by magnetron sputtering

    SciTech Connect

    Liu, Ziheng Hao, Xiaojing; Ho-Baillie, Anita; Green, Martin A.

    2014-02-03

    In this work, one-step aluminium-assisted crystallization of Ge on Si is achieved via magnetron sputtering by applying an in-situ low temperature (50 °C to 150 °C) heat treatment in between Al and Ge depositions. The effect of heat treatment on film properties and the growth mechanism of Ge epitaxy on Si are studied via X-ray diffraction, Raman and transmission electron microscopy analyses. Compared with the conventional two-step process, the one-step aluminium-assisted crystallization requires much lower thermal budget and results in pure Ge epitaxial layer, which may be suitable for use as a virtual substrate for the fabrication of III-V solar cells.

  16. Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Li, X.; Cao, W. H.; Tao, X. F.; Ren, L. L.; Zhou, L. Q.; Xu, G. F.

    2016-05-01

    Nb thin films were deposited onto Si wafers by direct current (DC) magnetron sputtering at different deposition pressures. The microstructure and nanomechanical properties of Nb films were investigated by scanning electron microscope, X-ray diffractometer, transmission electron microscope, atomic force microscope and nanoindenter. The results revealed that the grain size, thickness, surface roughness, the reduced elastic modulus ( Er) and hardness ( H) values of Nb thin films increased at the pressure range of 0.61-0.68 Pa. Meanwhile, the porosity of Nb films decreased with the increase in deposition pressure. The lattice deformation of Nb thin films changed from negative to positive with the increase in deposition pressure. It is concluded that deposition pressure influences the microstructure and nanomechanical properties of Nb films.

  17. Nitrogen Atom Energy Distributions in a Hollow-cathode Planar Sputtering Magnetron

    SciTech Connect

    D.N. Ruzic; M.J. Goeckner; Samuel A. Cohen; Zhehui Wang

    1999-06-01

    Energy distributions of N atoms in a hollow-cathode planar sputtering magnetron were obtained by use of optical emission spectroscopy. A characteristic line, N I 8216.3 Å, well-separated from molecular nitrogen emission bands, was identified. Jansson's nonlinear spectral deconvolution method, refined by minimization of {chi}w ² , was used to obtain the optimal deconvolved spectra. These showed nitrogen atom energies from 1 eV to beyond 500 eV. Based on comparisons with VFTRIM results, we propose that the energetic N atoms are generated from N2+ ions after these ions are accelerated through the sheath and dissociatively reflect from the cathode.

  18. Strong blue light emission from Eu-doped SiOC prepared by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Lin, Zhenxu; Guo, Yanqing; Wang, Xiang; Song, Chao; Song, Jie; Zhang, Yi; Huang, Rui

    2015-08-01

    The Eu-doped SiOC films were prepared by magnetron sputtering technique at a low temperature of 250°C. The effects of the Eu2O3 deposited power and post-thermal annealing temperature on the PL characteristics of the Eu-doped SiOC films were investigated. It is found that the photoluminescence intensity could be enhanced by more than tenfold by increasing the Eu2O3 deposited power from 20W to 80W. Furthermore, very bright blue light emission can be clearly observed with the naked eye in a bright room for the Eu-doped SiOC films prepared at a Eu2O3 deposited power of 80 W. The improved PL intensity is attributed to the increasing number density of europium silicate clusters as a result of the increasing Eu2O3 deposited power as well as high annealing temperatures.

  19. Particle visualization in high-power impulse magnetron sputtering. II. Absolute density dynamics

    SciTech Connect

    Britun, Nikolay Palmucci, Maria; Konstantinidis, Stephanos; Snyders, Rony

    2015-04-28

    Time-resolved characterization of an Ar-Ti high-power impulse magnetron sputtering discharge has been performed. The present, second, paper of the study is related to the discharge characterization in terms of the absolute density of species using resonant absorption spectroscopy. The results on the time-resolved density evolution of the neutral and singly-ionized Ti ground state atoms as well as the metastable Ti and Ar atoms during the discharge on- and off-time are presented. Among the others, the questions related to the inversion of population of the Ti energy sublevels, as well as to re-normalization of the two-dimensional density maps in terms of the absolute density of species, are stressed.

  20. Raman spectroscopy of copper oxide films deposited by reactive magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Levitskii, V. S.; Shapovalov, V. I.; Komlev, A. E.; Zav'yalov, A. V.; Vit'ko, V. V.; Komlev, A. A.; Shutova, E. S.

    2015-11-01

    Raman spectroscopy has been used to study the influence of partial oxygen pressure during deposition and isothermal treatment on the chemical composition of copper oxide films deposited by reactive dc magnetron sputtering of copper target in a reactive gaseous medium. Three series of films deposited at various partial oxygen pressures (from 0.06 to 0.16 mTorr) possessed different chemical compositions. The subsequent thermal treatment of all samples was performed for 30 min in air at a constant temperature in a 300?500°C interval. An increase in the annealing temperature led to chemical changes in the films. After isothermal treatment at 450°C, the films in all series acquired stoichiometric CuO composition.