Sample records for semi-insulating gaas doped

  1. Depth uniformity of electrical properties and doping limitation in neutron-transmutation-doped semi-insulating GaAs

    SciTech Connect

    Satoh, M.; Kuriyama, K. ); Kawakubo, T. )


    Depth uniformity of electrical properties has been evaluated for neutron-transmutation-doped (NTD), semi-insulating GaAs irradiated with thermal neutrons of 1.5{times}10{sup 18} cm{sup {minus}2} by the van der Pauw method combined with iterative etching of the surface. In NTD-GaAs wafers (thickness {similar to}410 {mu}m) annealed for 30 min at 700 {degree}C, the depth profiles of the resistivity, the carrier concentration, and the Hall mobility show constant values of 1{times}10{sup {minus}2} {Omega} cm, 2.0{times}10{sup 17} cm{sup {minus}3}, and 3100 cm{sup 2}/V s, respectively, within an experimental error of 5%. In an annealing process, the redistribution and/or the segregation of NTD impurities is not observed. We also discuss the limitations of low-level NTD in semi-insulating GaAs. It is suggested that the activation of the NTD-impurities below {similar to}1{times}10{sup 16} cm{sup {minus}3} is mainly restricted by the presence of the midgap electron trap (EL2).

  2. The contact and photoconductivity characteristics between Co doped amorphous carbon and GaAs: n-type low-resistivity and semi-insulated high-resistivity GaAs

    NASA Astrophysics Data System (ADS)

    Zhai, Zhangyin; Yu, Hualing; Zuo, Fen; Guo, Chunlian; Chen, Guibin; Zhang, Fengming; Wu, Xiaoshan; Gao, Ju


    The Co doped amorphous carbon films (a-C:Co), deposited by pulsed laser deposition, show p-n and ohmic contact characteristics with n-type low resistivity GaAs (L-GaAs) and semi-insulated high-resistivity GaAs (S-GaAs). The photosensitivity enhances for a-C:Co/L-GaAs, while inverse decreases for a-C:Co/S-GaAs heterojunction, respectively. Furthermore, the enhanced photosensitivity for the a-C:Co/L-GaAs/Ag heterojunction also shows deposition temperature dependence behavior, and the optimum deposition temperature is around 500 °C.

  3. GaAs Semi-Insulating Layer for a GaAs Device

    NASA Technical Reports Server (NTRS)

    Sherrill, G.; Mattauch, R. J.


    Improved design for GaAs electronic device or integrated circuit designed to operate at cryogenic temperatures, customary SiO2 insulating layer replaced by semi-insulating layer of GaAs. Thermal expansions of device and covering layer therefore match closely, and thermal stresses caused by immersion in cryogenic chamber nearly eliminated.

  4. 20 THz broadband generation using semi-insulating GaAs interdigitated photoconductive antennas.


    Hale, P J; Madeo, J; Chin, C; Dhillon, S S; Mangeney, J; Tignon, J; Dani, K M


    We demonstrate broadband (20 THz), high electric field, terahertz generation using large area interdigitated antennas fabricated on semi-insulating GaAs. The bandwidth is characterized as a function of incident pulse duration (15-35 fs) and pump energy (2-30 nJ). Broadband spectroscopy of PTFE is shown. Numerical Drude-Lorentz simulations of the generated THz pulses are performed as a function of the excitation pulse duration, showing good agreement with the experimental data. PMID:25401668

  5. Micro-inhomogeneity effects and radiation damage in semi-insulating GaAs radiation detectors

    SciTech Connect

    Bates, R.; O`Shea, V.; Raine, C.; Smith, K.M.; Didziulis, R.; Kazukauskas, V.; Rinkevicius, V.; Storasta, J.; Vaitkus, J.


    Thermally-stimulated current (TSC) measurements and a detailed analysis of current-voltage (I-V) characteristics have been made on semi-insulating GaAs (SI-GaAs) Schottky diode particle detectors, fabricated on substrates from several supplies, before and after irradiation with 24 GeV protons and 300 MeV pions. The analysis of I-V characteristics allows the determination of the barrier height and bulk resistance in detectors. Changes observed in I-V characteristics and TSC spectra after irradiation are described and a dislocation-net model of radiation-damaged devices is proposed.

  6. Detection of fast neutrons using detectors based on semi-insulating GaAs

    NASA Astrophysics Data System (ADS)

    Zat'ko, B.; Sedlačková, K.; Dubecký, F.; Boháček, P.; Sekáčová, M.; Nečas, V.


    Detectors with AuZn square Schottky contact of the area of 2.5 × 2.5 mm2 were fabricated. On the back side, the whole area AuGeNi eutectic ohmic contact was evaporated. The thickness of the base material (semi-insulating GaAs) was 220 μm. The connection of 4 detectors in parallel was tested to get the detection area of 25 mm2. The 239Pu-Be fast neutron source with energies between 0.5 and 12 MeV was used in experimental measurements. We have investigated the optimal thickness of HDPE (high-density polyethylene) conversion layer for fast neutron detection. The spectra of the neutrons were measured by detectors covered by HDPE converter of different thicknesses. The fast neutron detection efficiency proved experimentally was compared with results from simulations performed by MCNPX (Monte Carlo N-Particle eXtended) code.

  7. Light controlled prebreakdown characteristics of a semi-insulating GaAs photoconductive switch

    NASA Astrophysics Data System (ADS)

    Xiangrong, Ma; Wei, Shi; Weili, Ji; Hong, Xue


    A 4 mm gap semi-insulating (SI) GaAs photoconductive switch (PCSS) was triggered by a pulse laser with a wavelength of 1064 nm and a pulse energy of 0.5 mJ. In the experiment, when the bias field was 4 kV, the switch did not induce self-maintained discharge but worked in nonlinear (lock-on) mode. The phenomenon is analyzed as follows: an exciton effect contributes to photoconduction in the generation and dissociation of excitons. Collision ionization, avalanche multiplication and the exciton effect can supply carrier concentration and energy when an outside light source was removed. Under the combined influence of these factors, the SI-GaAs PCSS develops into self-maintained discharge rather than just in the light-controlled prebreakdown status. The characteristics of the filament affect the degree of damage to the switch.

  8. Gettering of donor impurities by V in GaAs and the growth of semi-insulating crystals

    NASA Technical Reports Server (NTRS)

    Ko, K. Y.; Lagowski, J.; Gatos, H. C.


    Vanadium added to the GaAs melt getters shallow donor impurities (Si and S) and decreases their concentration in the grown crystals. This gettering is driven by chemical reactions in the melt rather than in the solid. Employing V gettering, reproducibly semi-insulating GaAs were grown by horizontal Bridgman and liquid-encapsulated Czochralski techniques, although V did not introduce any midgap energy levels. The compensation mechanism in these crystals was controlled by the balance between the native midgap donor EL2 and residual shallow acceptors. Vanadium gettering contributed to the reduction of the concentration of shallow donors below the concentration of acceptors. The present findings clarify the long-standing controversy on the role of V in achieving semi-insulating GaAs.

  9. Introduction of metastable vacancy defects in electron-irradiated semi-insulating GaAs

    SciTech Connect

    Saarinen, K.; Kuisma, S.; Maekinen, J.; Hautojaervi, P.; Toernqvist, M.; Corbel, C.


    Positron-lifetime experiments have been performed to investigate the metastability of the point defects produced in the electron irradiation of semi-insulating GaAs. The measurements in darkness indicate the presence of Ga vacancies and Ga antisite defects in a negative charge state. Illumination at 25 K reveals another type of a defect, which has a vacancy in its metastable state. The metastable vacancies can be observed most effectively after illumination with 1.1-eV photons and they are persistent up to the annealing temperature of 80--100 K. The introduction rate of the metastable defects is about 0.3 cm{sup {minus}1}, which is close to the values reported earlier for the As antisite. The metastable properties of the defects resemble those of the well-known {ital EL}2 center in as-grown GaAs. We associate these defects to As antisites, which exhibit the metastability predicted by the theory: in the metastable configuration the As antisite atom relaxes away from the lattice position, leaving a Ga site vacant.

  10. Nonlinear transport of semi-insulating GaAs in a semiconductor gas discharge structure

    NASA Astrophysics Data System (ADS)

    Yücel Kurt, H.; Salamov, B. G.


    Nonlinear transport of a semi-insulating (SI) GaAs photodetector in a semiconductor gas discharge structure (SGDS) is studied experimentally for a wide range of gas pressures p, interelectrode distances d and different diameters D of the detector areas. While being driven with a stationary voltage, the system generates current and discharge light emission (DLE) instabilities with different amplitudes of the oscillations. The transformation of the profile and amplitude of the current density of the filaments in the different regions of the current-voltage characteristic (CVC) has been studied. Instabilities of spatially non-uniform distributions resulting in the formation of multiple current filaments with increasing voltages above the critical values have been observed. It is shown that the interelectrode distance only plays a passive role and is not responsible for the appearance of the DLE instability under the experimental conditions. At the same time, the expanded range of current and DLE oscillations are observed for different diameters D of the infrared (IR) photodetector areas. An SGDS with an N-shaped CVC is analysed using both the current and DLE data which show the electrical instability in the GaAs photodetector. It is found that the application of high feeding voltage to this photodetector gives rise to a non-uniform spatial distribution of the DLE, which disturbs the operation of the system. The experiment also presents a new method to study and visualize the electrical instabilities in a high-resistivity IR photodetector of large diameter.

  11. High resolution scanning photoluminescence characterization of semi-insulating GaAs using a laser scanning microscope

    NASA Astrophysics Data System (ADS)

    Marek, J.; Elliot, A. G.; Wilke, V.; Geiss, R.


    Spatially resolved photoluminescence properties of semi-insulating, liquid encapsulated Czochralski-grown GaAs substrates are analyzed with a laser scanning microscope. The improved resolution of the laser scanning microscope results in the observation of single dislocations within the subgrain boundaries of the polyganized dislocation cell network for the first time by photoluminescence. Both the cell structure and the Cottrell cloud are clearly resolved.

  12. Continuous wave terahertz radiation from antennas fabricated on C¹²-irradiated semi-insulating GaAs.


    Deshmukh, Prathmesh; Mendez-Aller, M; Singh, Abhishek; Pal, Sanjoy; Prabhu, S S; Nanal, Vandana; Pillay, R G; Döhler, G H; Preu, S


    We demonstrate continuous wave (CW) terahertz generation from antennas fabricated on C12-irradiated semi-insulating (SI) GaAs substrates. The dark current drawn by the antennas fabricated on irradiated substrates is ∼3 to 4 orders of magnitude lower compared to antennas fabricated on un-irradiated substrates, while the photocurrents decrease by only ∼1.5 orders of magnitude. This can be attributed to the strong reduction of the carrier lifetime that is 2.5 orders of magnitude, with values around τ(rec)=0.2  ps. Reduced thermal heating allows for higher bias voltages to the irradiated antenna devices resulting in higher CW terahertz power, just slightly lower than that of low-temperature grown GaAs (LT GaAs)at similar excitation conditions. PMID:26421576

  13. Structural and optical properties of Cr-doped semi-insulating GaN epilayers

    SciTech Connect

    Mei, F.; Wu, K. M.; Pan, Y.; Han, T.; Liu, C.; Gerlach, J. W.; Rauschenbach, B.


    The properties of Cr-doped GaN epilayers grown by rf-plasma-assisted molecular beam epitaxy were studied. The deep acceptor nature of Cr was used to grow semi-insulating GaN epilayers on sapphire substrates for electronic device applications. The room-temperature (RT) sheet resistivity of the epilayers reached 10{sup 10} {omega}/square. The activation energy of dark conductivity was about 0.48 eV. Step-graded Al{sub x}Ga{sub 1-x}N/GaN (x=0.3-0.2) superlattices (SLs) were designed to filter dislocations. Transmission electron microscopy images showed that the SLs can dramatically reduce dislocation density. Al{sub 0.35}Ga{sub 0.65}N/GaN heterostructure grown on Cr-doped semi-insulating GaN epilayer exhibited a RT mobility of 960 cm{sup 2}/V s and sheet carrier density of 2.1x10{sup 13} cm{sup -2}.

  14. Study on the high-power semi-insulating GaAs PCSS with quantum well structure

    NASA Astrophysics Data System (ADS)

    Luan, Chongbiao; Wang, Bo; Huang, Yupeng; Li, Xiqin; Li, Hongtao; Xiao, Jinshui


    A high-power semi-insulating GaAs photoconductive semiconductor switch (PCSS) with quantum well structure was fabricated. The AlGaAs layer was deposited on the surface of the GaAs material, and the reflecting film and the antireflection film have been made on the surface of the GaAs and AlGaAs, respectively. When the prepared PCSS worked at a bias voltage of 9.8 kV and triggered by a laser pulse with an incident optical energy of 5.4 mJ, a wavelength of 1064 nm and an optical pulse width of 25 ns, the on-state resistance of the AlGaAs/GaAs PCSS was only 0.45 Ω, and the longevity of the AlGaAs/GaAs PCSS was larger than 106 shots. The results show that this structure reduces the on-state resistance and extends the longevity of the GaAs PCSS.

  15. Photocurrent spectra of semi-insulating GaAs M-S-M diodes: Role of the contacts

    NASA Astrophysics Data System (ADS)

    Dubecký, František; Oswald, Jiří; Kindl, Dobroslav; Hubík, Pavel; Dubecký, Matúš; Gombia, Enos; Šagátová, Andrea; Boháček, Pavol; Sekáčová, Mária; Nečas, Vladimír


    Current-voltage (I-V) characteristics and photocurrent (PC) spectra (600-1000 nm) of the metal-semiconductor-metal (M-S-M) structures based on high-quality undoped semi-insulating (SI) GaAs with AuGeNi backside contact and different semitransparent top contacts (AuGeNi, Pt, Gd and Nd) are reported, and analysed with the help of a simple physical model. It is shown that the dominant peak in the PC spectra and the change of photocurrent sign can be explained by a presence of two Schottky-like barriers at the top and bottom surfaces. In addition, I-V and PC results show dependence on the bias and its polarity, and on the contact metal used. The possible origins of these effects are discussed.

  16. Influence of EL2 deep level on photoconduction of semi-insulating GaAs under ultrashort pulse photoinjection

    NASA Astrophysics Data System (ADS)

    Shi, Wei; Xie, Guangyong


    To investigate the influence of EL2 deep level on photoconduction of in semi-insulating GaAs (SI-GaAs), a 3 mm-electrode-gap lateral SI-GaAs photoconductive chip was manufactured and tested by using ultrashort pulse laser with 1064 nm wavelength, 10 ns pulsewidth, 3.0 mm light spot diameter and single pulse energy mean of 3.0 mJ. Based on the experimental results and the theory of trapping effect, the photon absorption process of EL2 defects in SI-GaAs is analyzed. For the influence of EL2 deep level, the lifetime of the electron gets shorter and the persistent photoconductivity (PPC) is significant. With increasing of voltage, the decay time constant of photoconduction is reduced and the decay index gets bigger for the ultrashort pulse photoinjection.

  17. Emission characteristics of photoconductive antennas based on low-temperature-grown GaAs and semi-insulating GaAs.


    Tani, M; Matsuura, S; Sakai, K; Nakashima, S


    Terahertz radiation was generated with several designs of photoconductive antennas (three dipoles, a bow tie, and a coplanar strip line) fabricated on low-temperature-grown (LT) GaAs and semi-insulating (SI) GaAs, and the emission properties of the photoconductive antennas were compared with each other. The radiation spectrum of each antenna was characterized with the photoconductive sampling technique. The total radiation power was also measured by a bolometer for comparison of the relative radiation power. The radiation spectra of the LT-GaAs-based and SI-GaAs-based photoconductive antennas of the same design showed no significant difference. The pump-power dependencies of the radiation power showed saturation for higher pump intensities, which was more serious in SI-GaAs-based antennas than in LT-GaAs-based antennas. We attributed the origin of the saturation to the field screening of the photocarriers. PMID:18264312

  18. Gallium vacancies and gallium antisites as acceptors in electron-irradiated semi-insulating GaAs

    SciTech Connect

    Corbel, C.; Pierre, F. ); Saarinen, K.; Hautojaervi, P. ); Moser, P. )


    Positron-lifetime measurements show that acceptors are produced in semi-insulating GaAs by 1.5-MeV electron irradiation at 20 K. Two types of acceptors can be separated. The first ones are negative vacancy-type defects which anneal out over a very broad range of temperature between 77 and 500 K. The second ones are negative ion-type defects which are stable still at 450 K. The data show that these two types of defects are independent and do not form close pairs. We attribute both to gallium-related defects. We identify the ion-type acceptors as isolated gallium antisites. The vacancy-type acceptors are identified as gallium vacancies which are isolated or involved in negatively charged complexes. The introduction rate of the gallium antisite is estimated to be 1.8{plus minus}0.3 cm{sup {minus}1} in the fluence range 10{sup 17}--10{sup 18} cm{sup {minus}2} for 1.5-MeV electron irradiation at 20 K.

  19. Role of deep-level trapping on the surface photovoltage of semi-insulating GaAs

    NASA Astrophysics Data System (ADS)

    Liu, Qiang; Ruda, Harry E.


    Dual-beam (bias and probe) transient surface photovoltage (SPV) measurements were made on undoped semi-insulating GaAs over an extended temperature range. Above 270 K, SPV recovery transients following a bias pulse were shown to reflect near-surface conductivity changes; these are in turn controlled by surface-interface-state thermal emission. Owing to the absence of a strong surface electric field in this material, the emitted carriers are not immediately removed from the near-surface region. The recapturing of the emitted carriers is shown to be responsible for nonexponential conductivity and reciprocal-SPV transients. This behavior is considered to be characteristic of relaxation-type semiconductors with near-surface ungated structures. Below 150 K, the photoinduced transition of EL2 from its ground to metastable state EL2 was shown to change the effective electron and hole mobilities and augment the SPV signals immediately following the bias pulse. Thermally induced EL2 recovery above 120 K decreases the SPV signal from its maximum. This decay transient was analyzed and the decay rate fitted to a single exponential. An activation energy of 0.32 eV and a preexponential constant of 1.9×1012 s-1 were obtained, and attributed to the thermal recovery rate for EL2.

  20. Simulating and modeling the breakdown voltage in a semi-insulating GaAs P+N junction diode

    NASA Astrophysics Data System (ADS)

    Resfa, A.; Menezla, Brahimi. R.; Benchhima, M.


    This work aims to determine the characteristic I (breakdown voltage) of the inverse current in a GaAs PN junction diode, subject to a reverse polarization, while specifying the parameters that influence the breakdown voltage of the diode. In this work, we simulated the behavior of the ionization phenomenon by impact breakdown by avalanche of the PN junctions, subject to an inverse polarization. We will take into account both the trapping model in a stationary regime in the P+N structure using like material of basis the III-V compounds and mainly the GaAs semi-insulating in which the deep centers have in important densities. We are talking about the model of trapping in the space charge region (SCR) and that is the trap density donor and acceptor states. The carrier crossing the space charge region (SCR) of W thickness creates N electron—hole pairs: for every created pair, the electron and the hole are swept quickly by the electric field, each in an opposite direction, which comes back, according to an already accepted reasoning, to the crossing of the space charge region (SCR) by an electron or a hole. So the even N pair created by the initial particle provoke N2 ionizations and so forth. The study of the physical and electrical behaviour of semiconductors is based on the influence of the presence of deep centers on the characteristic I(V) current-tension, which requires the calculation of the electrostatic potential, the electric field, the integral of ionization, the density of the states traps, the diffusion current of minority in the regions (1) and (3), the current thermal generation in the region (2), the leakage current in the surface, and the breakdown voltage.

  1. Lateral npn junction and semi-insulating GaAs current confinement structure for index-guided InGaAs/AlGaAs lasers by molecular beam epitaxy

    SciTech Connect

    Takamori, Takeshi; Watanabe, Kenji; Kamijoh, Takeshi )


    A novel current confinement structure with a lateral npn junction and a semi-insulating GaAs (SI-GaAs) is examined for an index-guided InGaAs/AlGaAs strained quantum-well laser. An amphoteric doping of Si in GaAs and AlGaAs is used to form the lateral npn structure grown over a channeled patterned low-temperature grown Si-GaAs layer. A threshold current of 7.4 mA and total external differential quantum efficiency of 59% under room-temperature continuous-wave operation are achieved with devices fabricated by a self-aligned process. The device with AR-HR coatings emitted the light output over 300 mW.

  2. Photo-induced changes of hydrogen bonding in semi-insulating iron-doped indium phosphide

    NASA Astrophysics Data System (ADS)

    Pajot, B.; Song, C.-Y.; Darwich, R.; Gendron, F.; Ewels, C.


    After illumination with 1-1.3 eV photons during cooling-down, metastable PH modes are observed by IR absorption at 5 K in semi-insulating InP:Fe. They correlate with the photo-injection of holes, but not with a change of the charge state of the H-related centres present at equilibrium. They are explained by a change of the bonding of H, induced by hole trapping, from IR-inactive centres to PH-containing centres, stable only below 80 K. One metastable centre has well-defined geometrical parameters and the other one could be located in a region near from the interface with (Fe,P) precipitates.

  3. The reverse mode of the photo activated charge domain in high field biased semi-insulating GaAs

    NASA Astrophysics Data System (ADS)

    Qu, Guanghui; Shi, Wei


    The nonlinear accumulation of the photogenerated electrons in high field biased SI-GaAs has been defined as photo activated charge domain (PACD). The transient transport dynamics of the PACD is investigated. The result shows that the PACD, working as a reverse gun dipole domain when biased electric field much higher than 4 kV/cm, and the reverse mode of the PACD could dominate the electric field shielding by its main electric field ultrafast and exponential rising against the bias field. Such mechanisms could play an important role in GaAs THz antenna, GaAs photoconductive semiconductor switch, and the other ultrafast GaAs devices.

  4. High Resolution Parameter-Space from a Two-Level Model on Semi-Insulating GaAs

    NASA Astrophysics Data System (ADS)

    da Silva, S. L.; Viana, E. R.; de Oliveira, A. G.; Ribeiro, G. M.; da Silva, R. L.

    Semi-insulating Gallium Arsenide (SI-GaAs) samples experimentally show, under high electric fields and even at room temperature, negative differential conductivity in N-shaped form (NNDC). Since the most consolidated model for n-GaAs, namely, "the model", proposed by E. Schöll was not capable to generate the NNDC curve for SI-GaAs, in this work we have proposed an alternative model. The model proposed, "the two-valley model" is based on the minimal set of generation-recombination equations for two valleys inside of the conduction band, and an equation for the drift velocity as a function of the applied electric field, that covers the physical properties of the nonlinear electrical conduction of the SI-GaAs system. The "two-valley model" was capable to generate theoretically the NNDC region for the first time, and with that, we were able to build a high resolution parameter-space of the periodicity (PSP) using a Periodicity-Detection (PD) routine. In the parameter-space were observed self-organized periodic structures immersed in chaotic regions. The complex regions are presented in a "shrimp" shape rotated around a focal point, which forms in large-scale a "snail shell" shape, with intricate connections between different "shrimps". The knowledge of detailed information on parameter spaces is crucial to localize wide regions of smooth and continuous chaos.

  5. EBIC spectroscopy - A new approach to microscale characterization of deep levels in semi-insulating GaAs

    NASA Technical Reports Server (NTRS)

    Li, C.-J.; Sun, Q.; Lagowski, J.; Gatos, H. C.


    The microscale characterization of electronic defects in (SI) GaAs has been a challenging issue in connection with materials problems encountered in GaAs IC technology. The main obstacle which limits the applicability of high resolution electron beam methods such as Electron Beam-Induced Current (EBIC) and cathodoluminescence (CL) is the low concentration of free carriers in semiinsulating (SI) GaAs. The present paper provides a new photo-EBIC characterization approach which combines the spectroscopic advantages of optical methods with the high spatial resolution and scanning capability of EBIC. A scanning electron microscope modified for electronic characterization studies is shown schematically. The instrument can operate in the standard SEM mode, in the EBIC modes (including photo-EBIC and thermally stimulated EBIC /TS-EBIC/), and in the cathodo-luminescence (CL) and scanning modes. Attention is given to the use of CL, Photo-EBIC, and TS-EBIC techniques.

  6. The influence of high-energy electrons irradiation on the electrical properties of Schottky barrier detectors based on semi-insulating GaAs

    NASA Astrophysics Data System (ADS)

    Zatko, B.; Sagatova, A.; Bohacek, P.; Sedlackova, K.; Sekacová, M.; Arbet, J.; Necas, V.


    In this work we fabricated detectors based on semi-insulating GaAs and studied their electrical properties (current-voltage characteristics, galvanomagnetic measurements) after irradiation with 5 MeV electrons from a linear accelerator up to a dose of 104 kGy. A series of detectors were prepared using Ti/Pt/Au Schottky contact with 1 mm diameter. The thickness of the base material was about 230 μm. A whole area Ni/AuGe/Au ohmic contact was evaporated on the back side. For galvanomagnetic measurements we used three samples from the same wafer. All samples were irradiated by a pulse beam of 5 MeV electrons using the linear accelerator in 11 steps, where the accumulative dose increased from 1 kGy up to 104 kGy. Also different dose rates (20, 40 and 80 kGy/h) were applied to the samples. After each irradiation step we performed electrical measurement of each sample. We analyze the electron Hall mobility, resistivity, electron Hall concentration, breakdown voltage and reverse current of samples before and after irradiation using different dose rates.

  7. Semi-insulating GaAs and Au Schottky barrier photodetectors for near-infrared detection (1280 nm)

    NASA Astrophysics Data System (ADS)

    Nusir, A. I.; Makableh, Y. F.; Manasreh, O.


    Schottky barriers formed between metal (Au) and semiconductor (GaAs) can be used to detect photons with energy lower than the bandgap of the semiconductor. In this study, photodetectors based on Schottky barriers were fabricated and characterized for the detection of light at wavelength of 1280 nm. The device structure consists of three gold fingers with 1.75 mm long and separated by 0.95 mm, creating an E shape while the middle finger is disconnected from the outer frame. When the device is biased, electric field is stretched between the middle finger and the two outermost electrodes. The device was characterized by measuring the current-voltage (I-V) curve at room temperature. This showed low dark current on the order of 10-10 A, while the photocurrent was higher than the dark current by four orders of magnitude. The detectivity of the device at room temperature was extracted from the I-V curve and estimated to be on the order of 5.3x1010 cm.Hz0.5/W at 5 V. The step response of the device was measured from time-resolved photocurrent curve at 5 V bias with multiple on/off cycles. From which the average recovery time was estimated to be 0.63 second when the photocurrent decreases by four orders of magnitude, and the average rise time was measured to be 0.897 second. Furthermore, the spectral response spectrum of the device exhibits a strong peak close to the optical communication wavelength (~1.3 μm), which is attributed to the internal photoemission of electrons above the Schottky barrier formed between Au and GaAs.

  8. High-Resistivity Semi-insulating AlSb on GaAs Substrates Grown by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Vaughan, E. I.; Addamane, S.; Shima, D. M.; Balakrishnan, G.; Hecht, A. A.


    Thin-film structures containing AlSb were grown using solid-source molecular beam epitaxy and characterized for material quality, carrier transport optimization, and room-temperature radiation detection response. Few surface defects were observed, including screw dislocations resulting from shear strain between lattice-mismatched layers. Strain was also indicated by broadening of the AlSb peak in x-ray diffraction measurements. Threading dislocations and interfacial misfit dislocations were seen with transmission electron microscopy imaging. Doping of the AlSb layer was introduced during growth using GaTe and Be to determine the effect on Hall transport properties. Hall mobility and resistivity were largest for undoped AlSb samples, at 3000 cm2/V s and 106 Ω cm, respectively, and increased doping levels progressively degraded these values. To test for radiation response, p-type/intrinsic/ n-type (PIN) diode structures were grown using undoped AlSb on n-GaAs substrates, with p-GaSb cap layers to protect the AlSb from oxidation. Alpha-particle radiation detection was achieved and spectra were produced for 241Am, 252Cf, and 239Pu sources. Reducing the detector surface area increased the pulse height observed, as expected based on voltage-capacitance relationships for diodes.

  9. Implanted Si atoms shifting between Ga sites and As sites by thermal stress in conductive-layer GaAs crystals on semi-insulating substrates

    NASA Astrophysics Data System (ADS)

    Saito, Yasuyuki


    Large (0.8 V order) discrepancies of threshold voltage Vth between the predicted Vth values by the Lindhard-Scharff-Schio/tt Gaussian approximate calculation and the Vth of the tungsten nitride (WNx) self-alignment (SA) gate GaAs metal-semiconductor field-effect transistors (MESFETs) were observed. These discrepancies were confirmed by the comparison of the Vth of the WNx-SA-gate MESFETs and the Vth of the (N+: high carrier concentration layers self-aligned of source-drain electrodes)-less conventional MESFETs on 2-in.-diam semi-insulating substrates from liquid-encapsulated-Czochralski-technique-grown <100> boules. The discrepancy was also analyzed by the capacitance-voltage (C-V) measurement of large-diameter (440 μm) Schottky diodes which were built into the MESFET arrays. It was found that for obtained SA-process carrier depth profiles (Si, 150 keV, 3×1012 cm-2) the carrier concentration at a depth of 0.25 μm decreased from 5.3×1016 to 2.0×1016 cm-3, but, on the other hand, the peak carrier concentration slightly decreased from 12.8×1016 to 12.4×1016 cm-3. By the calculation for Vth on the basis of the actual C-V carrier depth profiles, it was found that the carrier concentration decrease was comparable to the Vth variation (0.8 V). Furthermore, the Vth variation of the shallow channel implantation (50 keV) was comparable to that of the deep channel implantation (150 keV). As a result of the experiment and analysis, it was found that the large Vth variation for the SA N+ process was caused by reoccupation (Ga sites to As sites) of implanted Si atoms in the channel active-layer crystal by tensile stress formed by the thermal-expansion coefficient difference between chemical-vapor deposition (CVD) phosphosilicate glass (or CVD SiO2) film and (100) GaAs substrate crystal. The Si atom reoccupation quantity was, for the first time, explained by the Si atom compensation ratio equation as a function of the bond length (Si-As and Si-Ga) variation, an equation

  10. A stress gettering mechanism in semi-insulating, copper-contaminated gallium arsenide

    NASA Astrophysics Data System (ADS)

    Kang, Nam Soo; Zirkle, Thomas E.; Schroder, Dieter K.


    We have demonstrated a stress gettering mechanism in semi-insulating, copper-contaminated gallium arsenide (GaAs) using cathodoluminescence (CL), thermally stimulated current spectroscopy (TSC), and low temperature Fourier transform infrared spectroscopy (FTIR). Cathodoluminescence shows a local gettering effect around dislocation cores in bulk semi-insulating GaAs qualitatively. This gettering result was confirmed by low temperature FTIR data, which show absorption features resulting from the transition of electrons from the valence band to copper levels. The energy level of each absorption shoulder corresponds to the various copper levels in GaAs. After gettering, the absorption depth at each shoulder decreases. Thermally stimulated current measurements show changes after copper doping. The characteristic returns to that of uncontaminated GaAs after gettering. On the basis of these qualitative and quantitative data, we conclude that copper was gettered, and we propose a stress gettering mechanism in semi-insulating, copper-contaminated GaAs on the basis of dislocation cores acting as localized gettering sites.

  11. A comparative study of the defects in Fe-doped or undoped semi-insulating InP after high temperature annealing

    SciTech Connect

    Cherkaoui, K.; Kallel, S.; Marrakchi, G.; Karoui, A.


    Fe-doped or undoped semi-insulating InP samples submitted to high temperature annealing process have been studied by Photoinduced current transient spectroscopy (PICTS) in order to compare the traps observed. The PICTS spectra of these samples show separately the presence of a multitude of traps having activation energies ranging from 0.12 eV to 0.66 eV. The Fe{sub In} trap level has not been clearly observed in all the samples. The comparison of the thermal parameters of the observed traps allows to assign some of them to a same defect. However, the identification seems to be less evident concerning other traps and should be rather related to the properties of the starting material.

  12. Room-temperature particle detectors with guard rings based on semi-insulating InP co-doped with Ti and Zn

    NASA Astrophysics Data System (ADS)

    Yatskiv, R.; Zdansky, K.; Pekarek, L.


    Particle detectors made with a guard-ring (GR) electrode, operating at room temperature, have been studied. The detectors were fabricated on a semi-insulating InP crystal co-doped with Ti and Zn, grown using the Liquid-Encapsulated Czochralski technique. The detection performance of the particle detectors was evaluated using alpha particles emitted from a 241Am source. Good detector performance has been achieved with measured charge-collection efficiencies of 99.9% and 98.2% and FWHM energy resolutions of 0.9% and 2.1%. The measurements were carried out at 230 K for negative and positive bias voltages of the irradiated electrode. The good performance is due to the SI properties of the material which has been achieved by doping with suitable Ti atoms and co-doping with a low concentration of Zn acceptors, sufficient to fully compensate shallow donors. Electron and hole charge-collection efficiencies (CCEs) were measured at various temperatures. At room temperature, unlike at low temperature ( T<250 K), the hole CCE was better than the electron CCE, which can be explained by the presence of electron-trapping centres in InP with a temperature-dependent capture rate.

  13. Measured and computed performance of a microstrip filter composed of semi-insulating GaAs on a fused quartz substrate

    NASA Technical Reports Server (NTRS)

    Siegel, Peter H.; Dengler, Robert J.; Oswald, John E.; Sheen, David M.; Ali, Sami M.


    The performance of a microstrip hammerhead filter that has been fabricated on an electrically thin layer of semiinsulating GaAs backed by a fused quartz substrate was measured and compared to results of a three-dimensional finite-difference time-domain (FD-TD) program used to calculate the response of the filter both with and without the GaAs layer. The program, presented by Sheen et al. (1990), discretizes the entire structure and then simulates the propagation of a Gaussian pulse through the filter. The microstrip filter is intended for applications involving ultrathin lifted-off or etched-back GaAs containing both active devices and passive microstrip circuitry backed by a much thicker mechanically rigid low-loss, low-dielectric-constant substrate. The low-pass characteristics of the hammerhead filter with the intermediate GaAs layer are compared with those of the same filter on quartz alone. Both the measured and computed data show a significant shift in cutoff frequency (about 10 percent at the 3 dB points) for a GaAs layer that is 0.007 wavelengths thick at 4 GHz.

  14. High-resolution transmission electron microscopy study on the growth modes of GaSb islands grown on a semi-insulating GaAs (001) substrate

    NASA Astrophysics Data System (ADS)

    Kim, Y. H.; Lee, J. Y.; Noh, Y. G.; Kim, M. D.; Oh, J. E.


    The initial growth behaviors of GaSb on a GaAs substrate were studied using a high-resolution electron microscope (HRTEM). Four types of GaSb islands were observed by HRTEM. HRTEM micrographs showed that strain relaxation mechanisms were different in the four types of islands. Although 90° misfit dislocations relieve misfit strain in the islands, additional mechanisms are required to relax the remaining strain. The existence of elastic deformation near the surface related to dislocations and intermediate layers between GaSb and GaAs were demonstrated in island growths. Finally, the generation of planar defects to relieve strain was observed in a specific GaSb growth.

  15. Anomalous diffusion of Ga and As from semi-insulating GaAs substrate into MOCVD grown ZnO films as a function of annealing temperature and its effect on charge compensation

    SciTech Connect

    Biswas, Pranab; Banerji, P.; Halder, Nripendra N.; Kundu, Souvik; Shripathi, T.; Gupta, M.


    The diffusion behavior of arsenic (As) and gallium (Ga) atoms from semi-insulating GaAs (SI-GaAs) into ZnO films upon post-growth annealing vis-à-vis the resulting charge compensation was investigated with the help of x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy. The films, annealed at 600 ºC and 700 ºC showed p-type conductivity with a hole concentration of 1.1 × 10{sup 18} cm{sup −3} and 2.8 × 10{sup 19} cm{sup −3} respectively, whereas those annealed at 800 ºC showed n-type conductivity with a carrier concentration of 6.5 × 10{sup 16} cm{sup −3}. It is observed that at lower temperatures, large fraction of As atoms diffused from the SI-GaAs substrates into ZnO and formed acceptor related complex, (As{sub Zn}–2V{sub Zn}), by substituting Zn atoms (As{sub Zn}) and thereby creating two zinc vacancies (V{sub Zn}). Thus as-grown ZnO which was supposed to be n-type due to nonstoichiometric nature showed p-type behavior. On further increasing the annealing temperature to 800 ºC, Ga atoms diffused more than As atoms and substitute Zn atoms thereby forming shallow donor complex, Ga{sub Zn}. Electrons from donor levels then compensate the p-type carriers and the material reverts back to n-type. Thus the conversion of carrier type took place due to charge compensation between the donors and acceptors in ZnO and this compensation is the possible origin of anomalous conduction in wide band gap materials.

  16. Photoluminescence of Mn+ doped GaAs

    NASA Astrophysics Data System (ADS)

    Zhou, Huiying; Qu, Shengchun; Liao, Shuzhi; Zhang, Fasheng; Liu, Junpeng; Wang, Zhanguo


    Photoluminescence is one of the most useful techniques to obtain information about optoelectronic properties and defect structures of materials. In this work, the room-temperature and low temperature photoluminescence of Mn-doped GaAs were investigated, respectively. Mn-doped GaAs structure materials were prepared by Mn+ ion implantation at room temperature into GaAs. The implanted samples were subsequently annealed at various temperatures under N2 atmosphere to recrystallize the samples and remove implant damage. A strong peak was found for the sample annealed at 950 °C for 5 s. Transitions near 0.989 eV (1254 nm), 1.155 eV (1074 nm) and 1.329 eV (933 nm) were identified and formation of these emissions was analyzed for all prepared samples. This structure material could have myriad applications, including information storage, magnet-optical properties and energy level engineering.

  17. GaAs MESFET with lateral non-uniform doping

    NASA Technical Reports Server (NTRS)

    Wang, Y. C.; Bahrami, M.


    An analytical model of the GaAs MESFET with arbitrary non-uniform doping is presented. Numerical results for linear lateral doping profile are given as a special case. Theoretical considerations predict that better device linearity and improved F(T) can be obtained by using linear lateral doping when doping density increases from source to drain.

  18. Mixed conduction in semi-insulating gallium arsenide

    NASA Astrophysics Data System (ADS)

    Winter, J. J.; Leupold, H. A.; Ross, R. L.; Ballato, A.


    Hall effect and conductivity measurements made on semi-insulating bulk GaAs are examined by a new approach to mixed conduction analysis. Based on Fermi level and electron mobility analyses of conductivity and Hall coefficient, it uses revised values of effective densities of states at the band edges, and electron/hole mobility ratios recently adopted by other workers. The treatment provides a visual analysis of the system in terms of the electrical parameters and impurity densities, and establishes criteria for the onset of mixed conduction.

  19. Advanced BCD technology with vertical DMOS based on a semi-insulation structure

    NASA Astrophysics Data System (ADS)

    Kui, Ma; Xinghua, Fu; Jiexin, Lin; Fashun, Yang


    A new semi-insulation structure in which one isolated island is connected to the substrate was proposed. Based on this semi-insulation structure, an advanced BCD technology which can integrate a vertical device without extra internal interconnection structure was presented. The manufacturing of the new semi-insulation structure employed multi-epitaxy and selectively multi-doping. Isolated islands are insulated with the substrate by reverse-biased PN junctions. Adjacent isolated islands are insulated by isolation wall or deep dielectric trenches. The proposed semi-insulation structure and devices fixed in it were simulated through two-dimensional numerical computer simulators. Based on the new BCD technology, a smart power integrated circuit was designed and fabricated. The simulated and tested results of Vertical DMOS, MOSFETs, BJTs, resistors and diodes indicated that the proposed semi-insulation structure is reasonable and the advanced BCD technology is validated. Project supported by the National Natural Science Foundation of China (No. 61464002), the Science and Technology Fund of Guizhou Province (No. Qian Ke He J Zi [2014]2066), and the Dr. Fund of Guizhou University (No. Gui Da Ren Ji He Zi (2013)20Hao).

  20. Photoluminescence of Si-doped GaAs epitaxial layers

    SciTech Connect

    Yaremenko, N. G. Karachevtseva, M. V.; Strakhov, V. A.; Galiev, G. B.; Mokerov, V. G.


    The effect of arsenic pressure on the amphoteric behavior of Si during the growth of the Si-doped (100)-, (111)Ga-, and (111)As-oriented GaAs layers is studied by photoluminescence spectroscopy. The edge luminescence band is examined, and the concentration and the degree of compensation as functions of the arsenic pressure are determined. Nonstoichiometry defects in GaAs layers grown with a deficit and an excess of arsenic are studied. It is shown that the defects formed in the (111)Ga- and (111)As-oriented layers are different in nature.

  1. Photoluminescence of Be implanted Si-doped GaAs

    SciTech Connect

    Kroon, R.E.; Botha, J.R.; Neethling, J.H.; Drummond, T.J.


    Degenerately doped n-type GaAs produces band-to-band luminescence with the peak energy dependent on the carrier concentration. In this study the photoluminescence of Si-doped GaAs is examined after implantation with high energy Be ions and annealing. The band-to-band peak energy in the unimplanted (reference) material is shown to be smaller than reported values in Te-doped GaAs of the same carrier concentration. This is attributed to compensation in the Si doped material as a result of its amphoteric nature. For the implanted samples, no luminescence was recorded for the unannealed samples or those annealed at 400 C and 500 C. Comparing the relative peak intensities from material annealed at 600 C for 15 min and 30 min indicates an increase in the number of As vacancies with anneal time. For samples annealed at 700 C and 800 C, the dominant luminescence is associated with Ga{sub As} antisite defects. It is suggested that formation of these defects occurs predominantly only at these higher temperatures. Crystal recovery as measured by the luminescence intensity increased with both anneal temperature and time. For the implanted sample annealed at 800 C for 15 min, the dominant peak height was 25% of that from the reference sample.

  2. Optimum doping achieves high quantum yields in GaAs photoemitters

    NASA Technical Reports Server (NTRS)

    Sonnenberg, H.


    Experimental data indicate that optimum doping exists. Measured quantum yield curves indicate optimum overall response is obtained in GaAs emitters with doping in high 10 to the 18th power per cu cm range. Doping for optimum response is not necessarily in this range.

  3. Doping incorporation paths in catalyst-free Be-doped GaAs nanowires

    SciTech Connect

    Casadei, Alberto; Heiss, Martin; Colombo, Carlo; Ruelle, Thibaud; Fontcuberta i Morral, Anna; Krogstrup, Peter; Roehr, Jason A.; Upadhyay, Shivendra; Sorensen, Claus B.; Nygard, Jesper


    The incorporation paths of Be in GaAs nanowires grown by the Ga-assisted method in molecular beam epitaxy have been investigated by electrical measurements of nanowires with different doping profiles. We find that Be atoms incorporate preferentially via the nanowire side facets, while the incorporation path through the Ga droplet is negligible. We also show that Be can diffuse into the volume of the nanowire giving an alternative incorporation path. This work is an important step towards controlled doping of nanowires and will serve as a help for designing future devices based on nanowires.

  4. Comparative research on the transmission-mode GaAs photocathodes of exponential-doping structures

    NASA Astrophysics Data System (ADS)

    Chen, Liang; Qian, Yun-Sheng; Zhang, Yi-Jun; Chang, Ben-Kang


    Early research has shown that the varied doping structures of the active layer of GaAs photocathodes have been proven to have a higher quantum efficiency than uniform doping structures. On the basis of our early research on the surface photovoltage of GaAs photocathodes, and comparative research before and after activation of reflection-mode GaAs photocathodes, we further the comparative research on transmission-mode GaAs photocathodes. An exponential doping structure is the typical varied doping structure that can form a uniform electric field in the active layer. By solving the one-dimensional diffusion equation for no equilibrium minority carriers of transmission-mode GaAs photocathodes of the exponential doping structure, we can obtain the equations for the surface photovoltage (SPV) curve before activation and the spectral response curve (SRC) after activation. Through experiments and fitting calculations for the designed material, the body-material parameters can be well fitted by the SPV before activation, and proven by the fitting calculation for SRC after activation. Through the comparative research before and after activation, the average surface escape probability (SEP) can also be well fitted. This comparative research method can measure the body parameters and the value of SEP for the transmission-mode GaAs photocathode more exactly than the early method, which only measures the body parameters by SRC after activation. It can also help us to deeply study and exactly measure the parameters of the varied doping structures for transmission-mode GaAs photocathodes, and optimize the Cs-O activation technique in the future.

  5. Dielectric properties of semi-insulating silicon at microwave frequencies

    NASA Astrophysics Data System (ADS)

    Krupka, Jerzy; Kamiński, Paweł; Kozłowski, Roman; Surma, Barbara; Dierlamm, Alexander; Kwestarz, Michał


    The permittivity and dielectric loss tangent of high-purity silicon with semi-insulating properties achieved by the irradiation with 23-MeV protons have been measured at frequencies from 1 GHz to 15 GHz. The dielectric losses were separated from the conductor losses on the basis of the total loss tangent measurements versus frequency. The resistivity measurements of the material performed at radio frequencies (RF) by means of the capacitance spectroscopy method have shown the non-uniform resistivity distribution in the direction perpendicular to the surface of the semi-insulating wafer. The excellent agreement between the resistivity measurements results at RF and those obtained by using microwave methods have been achieved. It has been confirmed that high-purity, semi-insulating silicon is practically non-dispersive and possesses extremely low dielectric losses that are constant to within experimental errors in the frequency range from 1 GHz to 350 GHz. In this frequency range, the dielectric loss tangent of semi-insulating silicon is equal to 1.2 ×10-5 .

  6. Structural and optical characterization of Mg-doped GaAs nanowires grown on GaAs and Si substrates

    SciTech Connect

    Falcão, B. P. Leitão, J. P.; Correia, M. R.; Soares, M. R.; Morales, F. M.; Mánuel, J. M.; Garcia, R.; Gustafsson, A.; Moreira, M. V. B.; Oliveira, A. G. de; González, J. C.


    We report an investigation on the morphological, structural, and optical properties of large size wurtzite GaAs nanowires, low doped with Mg, grown on GaAs(111)B and Si(111) substrates. A higher density of vertical nanowires was observed when grown upon GaAs(111)B. Very thin zinc-blende segments are observed along the axis of the nanowires with a slightly higher linear density being found on the nanowires grown on Si(111). Low temperature cathodoluminescence and photoluminescence measurements reveal an emission in the range 1.40–1.52 eV related with the spatial localization of the charge carriers at the interfaces of the two crystalline phases. Mg related emission is evidenced by cathodoluminescence performed on the GaAs epilayer. However, no direct evidence for a Mg related emission is found for the nanowires. The excitation power dependency on both peak energy and intensity of the photoluminescence gives a clear evidence for the type II nature of the radiative transitions. From the temperature dependence on the photoluminescence intensity, non-radiative de-excitation channels with different activation energies were found. The fact that the estimated energies for the escape of the electron are higher in the nanowires grown on Si(111) suggests the presence of wider zinc-blende segments.

  7. Diffusion studies of Ra and Pb in GaAs by the alpha-particle energy loss method

    NASA Astrophysics Data System (ADS)

    Adamcyk, M.; Beaudoin, M.; Kelson, I.; Levy, Y.; Tiedje, T.


    The temperature dependence of the diffusion of lead in GaAs is determined by measuring the modification to the energy spectrum of emitted alpha particles from the decay chain of implanted 212Pb atoms. Diffusion rates are measured for temperatures up to 900 °C. Higher rates are observed for the diffusion in silicon-doped GaAs than in semi-insulating GaAs. An upper limit for the diffusion of radium in GaAs is similarly obtained from the decay of the 224Ra isotope. Implications for the use of implanted alpha sources for thickness monitoring during epitaxial film growth by the alpha-particle energy loss method are discussed.

  8. Inversion of spin dependent photocurrent at Fe3O4/modulation doped GaAs heterointerfaces

    NASA Astrophysics Data System (ADS)

    Shirahata, Y.; Wada, E.; Itoh, M.; Taniyama, T.


    We demonstrate inversion of the spin dependent photocurrent across an Fe3O4/modulation doped GaAs interface under optical spin orientation condition. The spin dependent photocurrent for fully epitaxial Fe3O4/GaAs and Fe/GaAs interfaces clearly show the opposite magnetic field dependence, where the spin filtering efficiency for the Fe3O4/GaAs decreases with increasing magnetic field. The results clearly indicate that the spin polarization of the Fe3O4 layer has the opposite sign to that of Fe at the Fermi energy, consistent with theoretical predictions, and the result is a consequence of the atomically flat Fe3O4/GaAs interface we obtained.

  9. Te-doping of self-catalyzed GaAs nanowires

    SciTech Connect

    Suomalainen, S. Hakkarainen, T. V.; Salminen, T.; Koskinen, R.; Guina, Mircea; Honkanen, M.; Luna, E.


    Tellurium (Te)-doping of self-catalyzed GaAs nanowires (NWs) grown by molecular beam epitaxy is reported. The effect of Te-doping on the morphological and crystal structure of the NWs is investigated by scanning electron microscopy and high-resolution transmission electron microscopy. The study reveals that the lateral growth rate increases and axial growth rate decreases with increasing Te doping level. The changes in the NW morphology can be reverted to some extent by changing the growth temperature. At high doping levels, formation of twinning superlattice is observed alongside with the (111)-facetted sidewalls. Finally, the incorporation of Te is confirmed by Raman spectroscopy.

  10. Temperature and intensity dependence of photorefractive effect in GaAs

    NASA Technical Reports Server (NTRS)

    Cheng, Li-Jen; Partovi, Afshin


    The photorefractive effect in semi-insulating Cr-doped GaAs as measured by the beam coupling technique was investigated as functions of temperature (295-386 K) and intensity (0.15-98 mW/sq cm of 1.15-micron light beams from a He-Ne laser). Results show that the photorefractive effect deteriorates rapidly over a narrow range of temperature as temperature rises, and that this characteristic temperature increases with the logarithm of beam intensity. The observed phenomenon is attributed to the competing effects of the dark- and light-induced conductivities.

  11. Determination of Fe{sup 2+} and Fe{sup 3+} concentrations of semi- insulating InP:Fe

    SciTech Connect

    Zach, F.X.; Bourret, E.D.; Bliss, D.; Weber, E.R.; Haller, E.E.


    Semi-insulating InP is most commonly obtained by doping with the deep acceptor iron to compensate the shallow donors which otherwise render the material n-type conducting. As the Fermi level in semi-insulating InP is closed to the iron acceptor level, both charge states - Fe{sup 2+} as well as Fe{sup 3+} corresponding to the acceptor level occupied unoccupied by an electron - are present. Mayor et al.(1) presented a method based on absorption measurements in the nearbandgap region of InP to determine the concentration of both charge states separately. In this paper we compare iron concentrations obtained by this method with the results from intracenter absorption, DLTS, EPR, Hall effect measurements and glow discharge mass spectroscopy. We present a new calibration for the optical absorption cross sections.

  12. Determination of Fe sup 2+ and Fe sup 3+ concentrations of semi- insulating InP:Fe

    SciTech Connect

    Zach, F.X.; Bourret, E.D. ); Bliss, D. ); Weber, E.R.; Haller, E.E. . Dept. of Materials Science and Mineral Engineering)


    Semi-insulating InP is most commonly obtained by doping with the deep acceptor iron to compensate the shallow donors which otherwise render the material n-type conducting. As the Fermi level in semi-insulating InP is closed to the iron acceptor level, both charge states - Fe{sup 2+} as well as Fe{sup 3+} corresponding to the acceptor level occupied unoccupied by an electron - are present. Mayor et al.(1) presented a method based on absorption measurements in the nearbandgap region of InP to determine the concentration of both charge states separately. In this paper we compare iron concentrations obtained by this method with the results from intracenter absorption, DLTS, EPR, Hall effect measurements and glow discharge mass spectroscopy. We present a new calibration for the optical absorption cross sections.

  13. Visible-light electroluminescence in Mn-doped GaAs light-emitting diodes

    NASA Astrophysics Data System (ADS)

    Nam Hai, Pham; Maruo, Daiki; Tanaka, Masaaki


    We observed visible-light electroluminescence (EL) due to d-d transitions in light-emitting diodes with Mn-doped GaAs layers (here, referred to as GaAs:Mn). Besides the band-gap emission of GaAs, the EL spectra show two peaks at 1.89 eV and 2.16 eV, which are exactly the same as 4A2(4F) → 4T1(4G) and 4T1(4G) → 6A1(6S) transitions of Mn atoms doped in ZnS. The temperature dependence and the current-density dependence are consistent with the characteristics of d-d transitions. We explain the observed EL spectra by the p-d hybridized orbitals of the Mn d electrons in GaAs.

  14. Increased Photoconductivity Lifetime in GaAs Nanowires by Controlled n-Type and p-Type Doping.


    Boland, Jessica L; Casadei, Alberto; Tütüncüoglu, Gözde; Matteini, Federico; Davies, Christopher L; Jabeen, Fauzia; Joyce, Hannah J; Herz, Laura M; Fontcuberta I Morral, Anna; Johnston, Michael B


    Controlled doping of GaAs nanowires is crucial for the development of nanowire-based electronic and optoelectronic devices. Here, we present a noncontact method based on time-resolved terahertz photoconductivity for assessing n- and p-type doping efficiency in nanowires. Using this technique, we measure extrinsic electron and hole concentrations in excess of 10(18) cm(-3) for GaAs nanowires with n-type and p-type doped shells. Furthermore, we show that controlled doping can significantly increase the photoconductivity lifetime of GaAs nanowires by over an order of magnitude: from 0.13 ns in undoped nanowires to 3.8 and 2.5 ns in n-doped and p-doped nanowires, respectively. Thus, controlled doping can be used to reduce the effects of parasitic surface recombination in optoelectronic nanowire devices, which is promising for nanowire devices, such as solar cells and nanowire lasers. PMID:26959350

  15. Design of quantum efficiency measurement system for variable doping GaAs photocathode

    NASA Astrophysics Data System (ADS)

    Chen, Liang; Yang, Kai; Liu, HongLin; Chang, Benkang


    To achieve high quantum efficiency and good stability has been a main direction to develop GaAs photocathode recently. Through early research, we proved that variable doping structure is executable and practical, and has great potential. In order to optimize variable doping GaAs photocathode preparation techniques and study the variable doping theory deeply, a real-time quantum efficiency measurement system for GaAs Photocathode has been designed. The system uses FPGA (Field-programmable gate array) device, and high speed A/D converter to design a high signal noise ratio and high speed data acquisition card. ARM (Advanced RISC Machines) core processor s3c2410 and real-time embedded system are used to obtain and show measurement results. The measurement precision of photocurrent could reach 1nA, and measurement range of spectral response curve is within 400~1000nm. GaAs photocathode preparation process can be real-time monitored by using this system. This system could easily be added other functions to show the physic variation of photocathode during the preparation process more roundly in the future.

  16. Doping concentration dependence of the photoluminescence spectra of n-type GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Arab, Shermin; Yao, Maoqing; Zhou, Chongwu; Daniel Dapkus, P.; Cronin, Stephen B.


    In this letter, the photoluminescence spectra of n-type doped GaAs nanowires, grown by the metal organic chemical vapor deposition method, are measured at 4 K and 77 K. Our measurements indicate that an increase in carrier concentration leads to an increase in the complexity of the doping mechanism, which we attribute to the formation of different recombination centers. At high carrier concentrations, we observe a blueshift of the effective band gap energies by up to 25 meV due to the Burstein-Moss shift. Based on the full width at half maximum (FWHM) of the photoluminescence peaks, we estimate the carrier concentrations for these nanowires, which varies from 6 × 1017 cm-3 (lightly doped), to 1.5 × 1018 cm-3 (moderately doped), to 3.5 × 1018 cm-3 (heavily doped) as the partial pressure of the disilane is varied from 0.01 sccm to 1 sccm during the growth process. We find that the growth temperature variation does not affect the radiative recombination mechanism; however, it does lead to a slight enhancement in the optical emission intensities. For GaAs nanowire arrays measured at room temperature, we observe the same general dependence of band gap, FWHM, and carrier concentration on doping.

  17. Neutron radiation effects in GaAs planar doped barrier diodes

    SciTech Connect

    Kearney, M.J.; Couch, N.R. ); Edwards, M. ); Dale, I. )


    The planar doped barrier (PDB) diode has recently been shown to be a very attractive alternative to the Schottky diode for many microwave and millimeter-wave mixer and detector applications. The authors have studied the degradation of GaAs planar doped barrier diodes subject to neutron irradiation. For fluences as high as 10[sup 15] cm[sup [minus]2] the diode characteristics are very well preserved, which strengthens the rationale for using these devices in place of Schottky diodes in harsh working environments such as nuclear instrumentation and space.

  18. Design considerations for a GaAs nipi doping superlattice solar cell

    NASA Technical Reports Server (NTRS)

    Clark, Ralph; Goradia, Chandra; Brinker, David


    A new GaAs nipi doping superlattice solar cell structure is presented, which holds promise for high efficiency coupled with very high radiation tolerance. The structure has all contacts on the unilluminated side. Design constraints are presented which this structure must satisfy in order to exhibit high efficiency and high radiation tolerance. The results of self-consistent quantum mechanical calculations are presented which show that a viable design of this cell would include relatively thick n and p layers which are fairly heavily doped.

  19. p-type doping of GaAs nanowires using carbon

    NASA Astrophysics Data System (ADS)

    Salehzadeh, O.; Zhang, X.; Gates, B. D.; Kavanagh, K. L.; Watkins, S. P.


    We report on the electrical properties of Au-catalyzed C-doped GaAs nanowires (NWs) grown by metal organic vapor phase epitaxy. Transport measurements were carried out using a tungsten nanoprobe inside a scanning electron microscope by contacting to the Au catalyst particle of individual nanowires. The doping level could be varied from approximately (4 ± 1) × 1016 cm-3 to (1.0 ± 0.3) × 1019 cm-3 by varying the molar flow of the gas phase carbon precursor, as well as the group V to group III precursor ratio. It was found that the current transport mechanism switches from generation-recombination to tunnelling field emission by increasing the doping level to 1 × 1019 cm-3. Based on a diameter-dependent analysis of the apparent resistivity of the C-doped NWs, we propose that C incorporates into GaAs NWs through the triple boundary at the Au/NW interface. The p-type conductivity of the C-doped NWs was inferred by observing a rectification at negative bias (applied to the Au electrode) and confirmed by back-gating measurements performed on field effect transistor devices.

  20. OM-VPE growth of Mg-doped GaAs. [OrganoMetallic-Vapor Phase Epitaxy

    NASA Technical Reports Server (NTRS)

    Lewis, C. R.; Dietze, W. T.; Ludowise, M. J.


    The epitaxial growth of Mg-doped GaAs by the organometallic vapor phase epitaxial process (OM-VPE) has been achieved for the first time. The doping is controllable over a wide range of input fluxes of bis (cyclopentadienyl) magnesium, (C5H5)2Mg, the organometallic precursor to Mg.

  1. Carbon doping in molecular beam epitaxy of GaAs from a heated graphite filament

    NASA Technical Reports Server (NTRS)

    Malik, R. J.; Nottenberg, R. N.; Schubert, E. F.; Walker, J. F.; Ryan, R. W.


    Carbon doping of GaAs grown by molecular beam epitaxy has been obtained for the first time by use of a heated graphite filament. Controlled carbon acceptor concentrations over the range of 10 to the 17th-10 to the 20th/cu cm were achieved by resistively heating a graphite filament with a direct current power supply. Capacitance-voltage, p/n junction and secondary-ion mass spectrometry measurements indicate that there is negligible diffusion of carbon during growth and with postgrowth rapid thermal annealing. Carbon was used for p-type doping in the base of Npn AlGaAs/GaAs heterojunction bipolar transistors. Current gains greater than 100 and near-ideal emitter heterojunctions were obtained in transistors with a carbon base doping of 1 x 10 to the 19th/cu cm. These preliminary results indicate that carbon doping from a solid graphite source may be an attractive substitute for beryllium, which is known to have a relatively high diffusion coefficient in GaAs.

  2. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

    SciTech Connect



    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 100 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer that is very effective in the suppression of filament formation, alleviating current crowding. Damage-free operation is now possible with virtually infinite expected lifetime at much higher current levels than before. The inherent damage-free current capacity of the bulk GaAs itself depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approx}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs, unlike a switch with conventional contacts. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

  3. Efficient defect structure analysis in semi-insulating materials by support vector machine and relevance vector machine

    NASA Astrophysics Data System (ADS)

    Jankowski, Stanisław; Będkowski, Janusz; Danilewicz, Przemysław; Szymański, Zbigniew


    We propose new approach for defect centers parameters extraction in semi-insulating GaAs. The experimental data is obtained by high-resolution photoinduced transient spectroscopy (HR-PITS). Two algorithms have been introduced: support vector machine - sequential minimal optimization (SVM-SMO) and relevance vector machine (RVM). Those methods perform the approximation of the Laplace surface. The advantages of proposed methods are: good accuracy of approximation, low complexity, excellent generalization. We developed SVM-RVM-PITS system, which enables graphical representation of Laplace surface, defining local area for defect parameter extraction, choosing the SVM or RVM method for approximation, calculation of the Arrhenius line factors and finally the parameters of the defect centers.

  4. Determination of doping effects on Si and GaAs bulk samples properties by photothermal investigations

    NASA Astrophysics Data System (ADS)

    Abroug, Sameh; Saadallah, Faycel; Yacoubi, Noureddine


    The knowledge of doping effects on optical and thermal properties of semiconductors is crucial for the development of opto-electronic compounds. The purpose of this work is to investigate these effects by mirage effect technique and spectroscopic ellipsometry SE. The near gap optical spectra are obtained from photothermal signal for differently doped Si and GaAs bulk samples. However, the above bandgap absorption is determined from SE. These spectra show that absorption in the near IR increases with dopant density and also the bandgap shifts toward low energies. This behavior is due to free carrier absorption which could be obtained by subtracting phonon-assisted absorption from the measured spectrum. This carrier absorption is related to the dopant density through a semi-empirical model. We have also used the photothermal signal phase to measure the influence of doping on thermal diffusivity.

  5. 2D-ACAR Studies on Swift Heavy Ion Si-Implanted GaAs

    NASA Astrophysics Data System (ADS)

    Sivaji, K.; Selvakumar, S.

    Material properties modification by high energy heavy ion implantation is a prospective technology leading to many device fabrications. This technique induces defects and hence the physical properties of the materials are modified. The effects of swift heavy ion implantation induced defects by 120 MeV 28+Si ion implantation and doping in SI-GaAs are presented from the electron momentum distribution (EMD) of vacancy-type defects studied by two-dimensional angular correlation of annihilation radiation (2D-ACAR). The positron trapping due to the influence of high-energy Si- implantation in GaAs (n-type) is compared with the corresponding spectra of SI- GaAs and with Si-doped (n-type) GaAs. The EMD of the implanted sample shows a distinct increased isotropic distribution with a characteristic transform of its structure as evident from the low momentum region compared to the pristine sample. The characteristics of defects created by Si doping and by 120 MeV 28+Si ion implantation of undoped semi-insulating (SI) GaAS are discussed. These results indicate the nature of positron trapping in open volume defects such as vacancy clusters created by implantation.

  6. Photoluminescence analysis of p-doped GaAs using the Roosbroeck Shockley relation

    NASA Astrophysics Data System (ADS)

    Ullrich, B.; Munshi, S. R.; Brown, G. J.


    Linking absorption with emission, the Roosbroeck-Shockley relation (RSR) expresses a fundamental principle of semiconductor optics. Despite its elementary character, the RSR is hardly advocated since it is commonly understood that the relation holds for intrinsic materials only. However, we demonstrate that the RSR reproduces very well the photoluminescence of p-doped GaAs over the temperature range of 5-300 K. The fitting parameters used, such as energy position and doping-induced band gap shrinkage, satisfactorily coincide with the literature. The presented results show that the RSR can have a much broader impact in semiconductor analysis than generally presumed. The paper is dedicated to our friend and mentor Rand R Biggers (1946-2006)

  7. Photoluminescence lineshape features of carbon δ-doped GaAs heterostructures.


    Schuster, J; Kim, T Y; Batke, E; Reuter, D; Wieck, A D


    Photoluminescence lineshape properties of quasi-two-dimensional electron systems in setback δ-doped GaAs heterostructures are studied at liquid helium temperature. Contributions from the ground and the first excited two-dimensional subband are clearly observed. A simple fit to the lineshape including broadening demonstrates that there is an exponential low-energy tail associated with the ground subband. No such tail is observed for the first excited subband. The fit precisely reveals the subband bottom energies, the Fermi energy, the electron temperature and the recombination intensities. A self-consistent calculation of subband properties including the potential contribution of the setback δ-doping reproduces well the subband properties and the recombination intensities. PMID:22446024

  8. Deep level domain spectroscopy of low frequency oscillations in semi-insulating InP

    NASA Astrophysics Data System (ADS)

    Backhouse, C.; Young, L.


    It is known that low frequency current oscillations occur in semi-insulating GaAs due to the formation and transit of high field domains caused by enhanced trapping of hot electrons by deep levels and that power density spectra of the current show peaks whose temperature dependence gives information on deep levels. In the present work Fe-compensated InP was investigated. The peaks rose from an approximately {1}/{f}{3}/{2} background and by estimating and removing this and by averaging many spectra, no less than 14 frequency peaks were resolved which gave straight lines on an Arrhenius plot of log( {T 2}/{2f}) vs{1}/{T}. Although the amplitude of the current oscillations is not so large as to preclude multiple domain propagation, it seems more likely that the domains are caused by hot electron trapping by one level only, rather than that several traps should have the necessary characteristics to launch domains. The multiplicity of peaks could be partly due to harmonics of the basic high field domain oscillation and partly due to conductivity modulation by other levels whose occupancies are changed by the passage of the domains: the task, if so, is to determine which peaks are which. The activation energies from the Arrhenius plots fell into groups close to 0.30, 0.39, 0.41, 0.44 and 0.49 eV. The 14 peaks thus are believed to arise from 5 deep levels. Evidence was found that the 0.49 eV level is iron-related and is responsible for producing the high field domains and for drain current drift in InP metal-insulator-semiconductor field-effect transistors.

  9. Current-voltage characteristics of silicon-doped GaAs nanowhiskers with a protecting AlGaAs coating overgrown with an undoped GaAs layer

    SciTech Connect

    Dementyev, P. A.; Dunaevskii, M. S. Samsonenko, Yu. B.; Cirlin, G. E.; Titkov, A. N.


    A technique for measurement of longitudinal current-voltage characteristics of semiconductor nanowhiskers remaining in contact with the growth surface is suggested. The technique is based on setting up a stable conductive contact between the top of a nanowhisker and the probe of an atomic-force microscope. It is demonstrated that, as the force pressing the probe against the top of the nanowhisker increases, the natural oxide layer covering the top is punctured and a direct contact between the probe and the nanowhisker body is established. In order to prevent nanowhiskers from bending and, ultimately, breaking, they need to be somehow fixed in space. In this study, GaAs nanowhiskers were kept fixed by partially overgrowing them with a GaAs layer. To isolate nanowhiskers from the matrix they were embedded in, they were coated by a nanometer layer of AlGaAs. Doping of GaAs nanowhiskers with silicon was investigated. The shape of the current-voltage characteristics obtained indicates that introduction of silicon leads to p-type conduction in nanowhiskers, in contrast to n-type conduction in bulk GaAs crystals grown by molecular-beam epitaxy. This difference is attributed to the fact that the vapor-liquid-solid process used to obtain nanowhiskers includes a final stage of liquid-phase epitaxy, a characteristic of the latter being p-type conduction obtained in bulk GaAs(Si) crystals.

  10. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

    SciTech Connect

    Baca, A.G.; Brown, D.J.; Donaldson, R.D.; Helgeson, W.D.; Hjalmarson, H.P.; Loubriel, G.M.; Mar, A.; O'Malley, M.W.; Thornton, R.L.; Zutavern, F.J.


    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 50 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer beneath the PCSS contacts which is very effective in the suppression of filament formation and alleviating current crowding to improve the longevity of PCSS. Virtually indefinite, damage-free operation is now possible at much higher current levels than before. The inherent damage-free current capacity of the switch depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approximately}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

  11. Large anomalous Hall resistance of pair {delta}-doped GaAs structures grown by molecular-beam epitaxy

    SciTech Connect

    Jung, D. W.; Noh, J. P.; Touhidul Islam, A. Z. M.; Otsuka, N.


    Beryllium/silicon pair {delta}-doped GaAs structures grown by molecular-beam epitaxy exhibit a Hall resistance which has a nonlinear dependence on the applied magnetic field and which is strongly correlated to the negative magnetoresistance observed under the applied magnetic field parallel to the {delta}-doped layers. Dependence of the occurrence of the nonlinear Hall resistance on the growth condition is investigated. A significantly large increase in both the magnitude and the nonlinearity of the Hall resistance is observed from samples whose GaAs buffer layers are grown under the condition of a low As/Ga flux ratio. Reflection high energy electron diffraction and electron microscope observations show that a faceted surface develops with the growth and postgrowth annealing of a GaAs buffer layer under the condition of a low As flux. From samples which have only Si {delta}-doped layers and exhibit the n-type conduction, such nonlinear Hall resistance is not observed. The nonlinearity of the Hall resistance of Be/Si pair {delta}-doped structures depends on the single parameter B/T, where B and T are the applied magnetic field and the temperature, respectively. Based on these results, it is suggested that the nonlinear Hall resistance of Be/Si pair {delta}-doped structures is the anomalous Hall effect caused by localized spins in {delta}-doped layers.

  12. Electrical spin injection in modulation-doped GaAs from an in situ grown Fe/MgO layer

    SciTech Connect

    Shim, Seong Hoon; Kim, Hyung-jun; Koo, Hyun Cheol; Lee, Yun-Hi; Chang, Joonyeon


    We study spin accumulation in n-doped GaAs that were electrically injected from Fe via MgO using three-terminal Hanle measurement. The Fe/MgO/GaAs structures were prepared in a cluster molecular beam epitaxy that did not require the breaking of the vacuum. We found the crystal orientation relationship of epitaxial structures Fe[100]//MgO[110]//GaAs[110] without evident defects at the interface. Control of depletion width and interface resistance by means of modulation doping improves spin injection, leading to enhanced spin voltage (ΔV) of 6.3 mV at 10 K and 0.8 mV even at 400 K. The extracted spin lifetime and spin diffusion length of GaAs are 220 ps and 0.77 μm, respectively, at 200 K. MgO tunnel barrier grown in situ with modulation doping at the interface appears to be promising for spin injection into GaAs.

  13. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R.; Davis, Jeffrey A.; Wang, Yuda; Smith, Leigh M.; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati


    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications.

  14. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires

    PubMed Central

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R.; Davis, Jeffrey A.; Wang, Yuda; Smith, Leigh M.; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati


    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications. PMID:27311597

  15. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires.


    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R; Davis, Jeffrey A; Wang, Yuda; Smith, Leigh M; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati


    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications. PMID:27311597

  16. High-field magnetoluminescence studies of Mn-doped GaAs epilayers

    NASA Astrophysics Data System (ADS)

    Meining, C. J.; Ruester, C.; Mallory, R.; Itskos, G.; Cheon, M.; Chen, X.; Wang, S.; Luo, H.; Petrou, A.; McCombe, B. D.; Wei, X.; Liu, X.; Sasaki, Y.; Furdyna, J. K.; Palczewska, M.


    We have carried out magnetoluminescence and magntotransport studies of three MBE grown GaAs epilayers. The samples were grown at a substrate temperature of 590^circC and randomly doped with manganese acceptors at different concentrations. The lowest density sample shows activated p-type resistivity, whereas the highly doped samples exhibit n-type metallic behavior. The latter result will be discussed in terms of MnAs precipitates as observed in TEM studies. The degree of circular polarization P of the conduction band to Mn-acceptor transition (CB arrow A(Mn)) was determined for magnetic fields up to 32 T at the NHMFL. In the lowest Mn concentration sample, P increases with magnetic field and saturates around 15 T. In the other two samples, P exhibits a step at about 22 T. These results will be discussed in terms of level crossing of the antiferromagnetically coupled neutral Mn acceptor pairs. >From this analysis we obtain a Mn-Mn coupling constant J of approximately 10 K. Work supported in part by DARPA/ONR N00014-00-1-0951

  17. X-band MMIC amplifier with pulse-doped GaAs MESFET's

    NASA Astrophysics Data System (ADS)

    Shiga, Nobuo; Nakajima, Shigeru; Otobe, Kenji; Sekiguchi, Takeshi; Kuwata, Nobuhiro; Matsuzaki, Ken-Ichiro; Hayashi, Hideki


    The design and test of an X-band monolithic four-stage low noise amplifier (LNA) with 0.5 micron-gate pulse-doped GaAs MESFETs for application in a direct broadcast satellite (DBS) converter is presented. The key feature of the research is a detailed demonstration of the advantages of using series feedback with experiments and simulations. This LNA shows an excellent input VSWR match under 1.4 as well as a noise figure of 1.67 dB and a gain of 24 dB at 12 GHz. The noise figure, the gain and VSWRs exhibit very little bias current dependence due to the exceptional features of the pulse-doped structure FETs and the optimized circuit design. Insensitivity to bias current implies performance stability in the face of process fluctuations. Thus, the yield of chips with noise figures of less than 2.0 dB is as high as 62.5 percent, and the variations of gain and VSWR are highly uniform as well.

  18. Specific features of the photoconductivity of semi-insulating cadmium telluride

    SciTech Connect

    Golubyatnikov, V. A.; Grigor’ev, F. I.; Lysenko, A. P. Strogankova, N. I.; Shadov, M. B.; Belov, A. G.


    The effect of local illumination providing a high level of free-carrier injection on the conductivity of a sample of semi-insulating cadmium telluride and on the properties of ohmic contacts to the sample is studied. It is found that, irrespective of the illumination region, the contact resistance of ohmic contacts decreases and the concentration of majority carriers in the sample grows in proportion to the illumination intensity. It is shown that inherent heterogeneities in crystals of semi-insulating semiconductors can be studied by scanning with a light probe.

  19. Mg-doping transients during metalorganic vapor phase epitaxy of GaAs and AlGaInP

    NASA Astrophysics Data System (ADS)

    Kondo, Makoto; Anayama, Chikashi; Sekiguchi, Hiroshi; Tanahashi, Toshiyuki


    We studied magnesium-doping transients during metalorganic vapor phase epitaxy of GaAs and (Al(x)Ga(1-x))(0.5)In(0.5)P (0 less than or = x less than or = 0.7). We examined the transient of Mg concentration depth profile through epitaxial layers when Mg precursors are initially injected into the reactor (doping delay). We found that increasing the Al composition of epitaxial layers, i.e., increasing the mole fraction of Al precursors in the reactor, significantly reduces the Mg-doping delay. We obtained this result for both trimethylaluminum (TMAl) and triethylaluminum (TEAl). We quantitatively modeled this phenomenon based on the competitive adsorption of Mg and Al precursors on the internal surface of the reactor. Our model also explains that the Mg concentration in epitaxial layers increases either linearly or superlinearly with the Mg precursor input, depending on the length of the doping delay.

  20. Effect of thin emitter set-back layer on GaAs delta-doped emitter bipolar junction transistor

    NASA Astrophysics Data System (ADS)

    Lew, K. L.; Yoon, S. F.


    GaAs delta-doped emitter bipolar junction transistors (δ-BJT) with different emitter set-back layer thicknesses of 10to50nm were fabricated to study the emitter set-back layer thickness effect on device dc performance. We found that the current gain decreases following decrease in the emitter set-back layer thickness. A detailed analysis was performed to explain this phenomenon, which is believed to be caused by reduction of the effective barrier height in the δ-BJT. This is due to change in the electric-field distribution in the delta-doped structure caused by the built-in potential of the base-emitter (B-E ) junction. Considering the recombination and barrier height reduction effects, the thickness of the emitter set-back layer should be designed according to the B-E junction depletion width with a tolerance of ±5nm. The dc performance of a δ-BJT designed based on this criteria is compared to that of a Al0.25Ga0.75As /GaAs heterojunction bipolar transistor (HBT). Both devices employed base doping of 2×1019cm-3 and base-to-emitter doping ratio of 40. Large emitter area (AE≈1.6×10-5cm-2) and small emitter area (AE≈1.35×10-6cm-2) device current gains of 40 and 20, respectively, were obtained in both types of transistors passivated by (NH4)2S treatment. The measured current gain of the GaAs δ-BJT is the highest reported for a homojunction device with such high base-to-emitter doping ratio normally used in HBT devices.

  1. Nano-structure fabrication of GaAs using AFM tip-induced local oxidation method: different doping types and plane orientations

    PubMed Central


    In this study, we have fabricated nano-scaled oxide structures on GaAs substrates that are doped in different conductivity types of p- and n-types and plane orientations of GaAs(100) and GaAs(711), respectively, using an atomic force microscopy (AFM) tip-induced local oxidation method. The AFM-induced GaAs oxide patterns were obtained by varying applied bias from approximately 5 V to approximately 15 V and the tip loading forces from 60 to 180 nN. During the local oxidation, the humidity and the tip scan speed are fixed to approximately 45% and approximately 6.3 μm/s, respectively. The local oxidation rate is further improved in p-type GaAs compared to n-type GaAs substrates whereas the rate is enhanced in GaAs(100) compared to and GaAs(711), respectively, under the identical conditions. In addition, the oxide formation mechanisms in different doping types and plane orientations were investigated and compared with two-dimensional simulation results. PMID:21978373

  2. Observations of exciton and carrier spin relaxation in Be doped p-type GaAs

    SciTech Connect

    Asaka, Naohiro; Harasawa, Ryo; Tackeuchi, Atsushi; Lu, Shulong; Dai, Pan


    We have investigated the exciton and carrier spin relaxation in Be-doped p-type GaAs. Time-resolved spin-dependent photoluminescence (PL) measurements revealed spin relaxation behaviors between 10 and 100 K. Two PL peaks were observed at 1.511 eV (peak 1) and 1.497 eV (peak 2) at 10 K, and are attributed to the recombination of excitons bound to neutral Be acceptors (peak 1) and the band-to-acceptor transition (peak 2). The spin relaxation times of both PL peaks were measured to be 1.3–3.1 ns at 10–100 K, and found to originate from common electron spin relaxation. The observed existence of a carrier density dependence of the spin relaxation time at 10–77 K indicates that the Bir-Aronov-Pikus process is the dominant spin relaxation mechanism.

  3. Enhancement of intensity-dependent absorption in InP and GaAs at 1.9 microns by doping

    NASA Technical Reports Server (NTRS)

    Li, N.-L.; Bass, M.; Swimm, R.


    It is pointed out that the study of intensity-dependent absorption (IDA) in general, and two-photon absorption (TPA), in particular, has suffered from experimental difficulties and inadequate theoretical models. Bass et al. (1979) could improve the experimental situation by making use of laser calorimetry to obtain directly the TPA coefficient of a medium with a high degree of sensitivity. In the present investigation, the employed technique has been used to study the effect of deep level dopants on IDA in InP and GaAs. It is found that the coefficient for IDA is strongly dependent on the presence of Fe in InP and Cr in GaAs. The conducted investigation had the objective to examine the effect of deep level impurities on IDA processes in InP and GaAs. Fe-doped InP and Cr-doped GaAs were compared with undoped crystals.

  4. Self-consistent calculations and design considerations for a GaAs nipi doping superlattice solar cell

    NASA Technical Reports Server (NTRS)

    Clark, Ralph O.; Goradia, Chandra; Brinker, David


    The authors present design constraints which show that a previously proposed GaAs nipi doping superlattice solar cell structure would not work as an efficient space solar cell. A structure based on the CLEFT process, which shows promise of being an efficient cell with very high radiation tolerance, is proposed. In order to test theoretically its viability and to optimize its design, self-consistent quantum mechanical calculations were made for a number of thicknesses of the n, i, and p layers and the dopings in the n and p layers. These results show that: 1) an i layer is not necessary; in fact, its presence makes it difficult to satisfy one of the key constraints; 2) a near-optimum design with 750-A thick n and p layers with dopings of 2.5E18/cu cm and a selective contact separation of 20 microns would yield both high efficiency and very high radiation tolerance.

  5. Surface passivation of tellurium-doped GaAs nanowires by GaP: Effect on electrical conduction

    SciTech Connect

    Darbandi, A.; Salehzadeh, O.; Watkins, S. P.; Kuyanov, P.; LaPierre, R. R.


    We report on the surface passivation of Au-assisted Te-doped GaAs nanowires (NWs) grown by metalorganic vapor phase epitaxy. The electrical properties of individual free standing NWs were assessed using a tungsten nano-probe inside a scanning electron microscope. The diameter independent apparent resistivity of both strained and relaxed passivated NWs suggests the unpinning of the Fermi level and reduction of sidewalls surface states density. Similar current-voltage properties were observed for partially axially relaxed GaAs/GaP NWs. This indicates a negligible contribution of misfit dislocations in the charge transport properties of the NWs. Low temperature micro-photoluminescence (μ-PL) measurements were also carried out for both uncapped and passivated GaAs NWs. The improvement of the integrated (μ-PL) intensity for GaAs/GaP NWs further confirms the effect of passivation.

  6. Radiation tolerant GaAs MESFET with a highly-doped thin active layer grown by OMVPE

    SciTech Connect

    Nishiguchi, M.; Hashinaga, T.; Nishizawa, H.; Hayashi, H. ); Okazaki, N. ); Kitagawa, M.; Fujino, T. )


    A new structure of GaAs MESFET with high radiation tolerance is proposed. Changes in electrical parameters of a GaAs MESFET as a function of total {gamma}-ray dose have been found to be caused mainly by a decrease in the effective carrier concentration in an active layer. The authors have designed a new structure from a simulation based on an empirical relationship between the changes of the effective carrier concentration and the total {gamma}-ray dose. It has been successfully demonstrated by utilizing a highly-doped thin active layer (4 {times} 10{sup 18} cm{sup {minus}3}, 100 {Angstrom}) grown by OMVPE. This MESFET can withstand a dose ten times higher (1 {times} 10{sup 9} rads(GaAs)) than a conventional one can.

  7. Low-temperature growth of GaSb epilayers on GaAs (001) by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Benyahia, D.; Kubiszyn, Ł.; Michalczewski, K.; Kębłowski, A.; Martyniuk, P.; Piotrowski, J.; Rogalski, A.


    Non-intentionally doped GaSb epilayers were grown by molecular beam epitaxy (MBE) on highly mismatched semi-insulating GaAs substrate (001) with 2 offcut towards [110]. The effects of substrate temperature and the Sb/Ga flux ratio on the crystalline quality, surface morphology and electrical properties were investigated by Nomarski optical microscopy, X-ray diffraction (XRD) and Hall measurements, respectively. Besides, differential Hall was used to investigate the hole concentration behaviour along the GaSb epilayer. It is found that the crystal quality, electrical properties and surface morphology are markedly dependent on the growth temperature and the group V/III flux ratio. Under the optimized parameters, we demonstrate a low hole concentration at very low growth temperature. Unfortunately, the layers grown at low temperature are characterized by wide FWHM and low Hall mobility.

  8. Low-temperature growth of GaSb epilayers on GaAs (001) by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Benyahia, D.; Kubiszyn, Ł.; Michalczewski, K.; KĘbŁOwski, , A.; Martyniuk, P.; Piotrowski, J.; Rogalski, A.


    Non-intentionally doped GaSb epilayers were grown by molecular beam epitaxy (MBE) on highly mismatched semi-insulating GaAs substrate (001) with 2 offcut towards [110]. The effects of substrate temperature and the Sb/Gaflux ratio on the crystalline quality, surface morphology and electrical properties were investigated by Nomarski optical microscopy, X-ray diffraction (XRD) and Hall measurements, respectively. Besides, differential Hall was used to investigate the hole concentration behaviour along the GaSb epilayer. It is found that the crystal quality, electrical properties and surface morphology are markedly dependent on the growth temperature and the group V/III flux ratio. Under the optimized parameters, we demonstrate a low hole concentration at very low growth temperature. Unfortunately, the layers grown at low temperature are characterized by wide FWHM and low Hall mobility.

  9. Electronic structures and magnetic stabilities of 2D Mn-doped GaAs nanosheets: The role of long-range exchange interactions and doping strategies

    SciTech Connect

    Lan, Mu; Xiang, Gang Zhang, Xi


    We investigate the structural, electronic and magnetic properties of Mn atoms doped two-dimensional (2D) hexagonal GaAs nanosheets (GaAsNSs) using both first-principle calculations and Monte Carlo simulations. The first-principle molecular dynamics is first used to test the structural stability of Mn-doped GaAsNS ((Ga,Mn)AsNS). The analysis of spin-resolved electronic structures and determination of magnetic exchange interactions based on density functional theory (DFT) calculations reveals the existence of long-range exchange interaction in the system. Finally, Metropolis Monte Carlo simulation is employed to estimate Curie temperatures (T{sub C}s) of (Ga,Mn)AsNSs with different doping concentrations by different doping strategies. The results indicate that a T{sub C} up to 82 K can be obtained in regularly-doped (Ga,Mn)AsNSs and doping strategies have prominent impact on T{sub C}s of the systems, which emphasizes the importance of both long-range interactions and doping strategies in reduced dimensional diluted magnetic semiconductors (DMSs)

  10. GaAs surface cleaning by thermal oxidation and sublimation in molecular-beam epitaxy

    NASA Astrophysics Data System (ADS)

    Saito, Junji; Nanbu, Kazuo; Ishikawa, Tomonori; Kondo, Kazuo


    GaAs surface cleaning by thermal oxidation and sublimation prior to molecular-beam-epitaxial growth has been investigated as a means of reducing the carrier depletion at the substrate and epitaxial layer interface. The carrier depletion between the substrate and epitaxial films, measured by a C-V carrier profiling technique, was shown to decrease significantly with an increase in the thickness of the thermal oxidation. The concentration of carbon contamination near the substrate-epitaxial interface was measured using secondary ion mass spectroscopy. The carbon concentration correlated very well with the carrier depletion. Therefore, the main origin of the carrier depletion is believed to be the carbon concentration of the initial growth surface. Based on these results, the thermal oxidation and sublimation of a semi-insulating GaAs substrate was successfully applied to improve the mobility and sheet concentration of the two-dimensional electron gas in selectively doped GaAs/N-Al0.3Ga0.7As heterostructures with very thin GaAs buffer layers.

  11. The influence of a doping profile on the characteristics of an ion-implanted GaAs field-effect transistor with a Schottky barrier

    SciTech Connect

    Shestakov, A. K. Zhuravlev, K. S.


    A GaAs field-effect ion-implanted transistor with a Schottky barrier is simulated. The doping profile obtained when doping through an insulator mask is determined and the dependences of the static transistor characteristics on the parameters of the doping profile are calculated and analyzed. The physical processes controlling the transistor characteristics in the case of a variation in the parameters of its doping profile and the coefficient of compensation of the substrate are studied. Based on calculations, the optimal doping-profile parameters ensuring the best characteristics for transistors are predicted.

  12. Emission-wavelength tuning of InAs quantum dots grown on nitrogen-δ-doped GaAs(001)

    NASA Astrophysics Data System (ADS)

    Kaizu, Toshiyuki; Taguchi, Kohei; Kita, Takashi


    We studied the structural and photoluminescence (PL) characteristics of InAs quantum dots (QDs) grown on nitrogen (N) δ-doped GaAs(001). The emission wavelength for low-density N-δ doping exhibited a blueshift with respect to that for undoped GaAs and was redshifted with increasing N-sheet density. This behavior corresponded to the variation in the In composition of the QDs. N-δ doping has two opposite and competing effects on the incorporation of Ga atoms from the underlying layer into the QDs during the QD growth. One is the enhancement of Ga incorporation induced by the lattice strain, which is due to the smaller radius of N atoms. The other is an effect blocking for Ga incorporation, which is due to the large bonding energy of Ga-N or In-N. At a low N-sheet density, the lattice-strain effect was dominant, while the blocking effect became larger with increasing N-sheet density. Therefore, the incorporation of Ga from the underlying layer depended on the N-sheet density. Since the In-Ga intermixing between the QDs and the GaAs cap layer during capping also depended on the size of the as-grown QDs, which was affected by the N-sheet density, the superposition of these three factors determined the composition of the QDs. In addition, the piezoelectric effect, which was induced with increased accumulation of lattice strain and the associated high In composition, also affected the PL properties of the QDs. As a result, tuning of the emission wavelength from 1.12 to 1.26 μm was achieved at room temperature.

  13. Ferroelectric films of barium strontium titanate on semi-insulating silicon carbide substrates

    NASA Astrophysics Data System (ADS)

    Tumarkin, A. V.; Razumov, S. V.; Gagarin, A. G.; Odinets, A. A.; Mikhailov, A. K.; Pronin, I. P.; Stozharov, V. M.; Senkevich, S. V.; Travin, N. K.


    Thin ferroelectric Ba x Sr1- x TiO3 (BST) layers have been grown for the first time on semi-insulating silicon carbide substrates by RF magnetron sputtering of a ceramic target without using buffer sublayers. Results of investigation of the structure of obtained BST films and the electrical properties of related planar capacitors are presented. The obtained structures are characterized by high nonlinearity and low dielectric losses at microwave frequencies.

  14. Longevity improvement of optically activated, high gain GaAs photoconductive semiconductor switches

    SciTech Connect



    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 100 million pulses at 23A, and over 100 pulses at 1kA. This is achieved by improving the ohmic contacts by doping the semi-insulating GaAs underneath the metal, and by achieving a more uniform distribution of contact wear across the entire switch by distributing the trigger light to form multiple filaments. This paper will compare various approaches to doping the contacts, including ion implantation, thermal diffusion, and epitaxial growth. The device characterization also includes examination of the filament behavior using open-shutter, infra-red imaging during high gain switching. These techniques provide information on the filament carrier densities as well as the influence that the different contact structures and trigger light distributions have on the distribution of the current in the devices. This information is guiding the continuing refinement of contact structures and geometries for further improvements in switch longevity.

  15. Photoluminescence study on heavily donor and acceptor impurity doped GaAs layers grown by molecular-beam epitaxy

    SciTech Connect

    Islam, A. Z. M. Touhidul; Jung, D. W.; Noh, J. P.; Otsuka, N.


    Gallium arsenide layers doped with high concentrations of Be and Si by molecular-beam epitaxy are studied by photoluminescence (PL) spectroscopy. PL peaks from doped layers are observed at energies significantly lower than the band-gap of GaAs. The growth and doping conditions suggest that the origin of these peaks is different from that of low energy PL peaks, which were observed in earlier studies and attributed to impurity-vacancy complexes. The dependence of the peak energy on the temperature and the annealing is found to differ from that of the peaks attributed to impurity-vacancy complexes. On the basis of these observations, it is suggested that the low energy peaks are attributed to short range ordered arrangements of impurity ions. This possibility is examined by calculations of the PL spectra with models of pairs of acceptor and donor delta-doped layers and PL experiments of a superlattice of pairs of Be and Si delta-doped layers.

  16. Controllable GMR device in a δ-doped, magnetically and electrically modulated, GaAs /Alx Ga1-x As heterostructure

    NASA Astrophysics Data System (ADS)

    Shen, Li-Hua; Zhang, Gui-Lian; Yang, Duan-Chui


    We report on a theoretical study of giant magnetoresistance (GMR) effect in a δ-doped GaAs /Alx Ga1-x As heterostructure modulated by two stripes of ferromagnetic metal and a stripe of Schottky metal in parallel configuration. The δ-doping dependent transmission and conductance of the device are calculated. It is shown that a considerable giant magnetoresistance (GMR) effect exists in this structure. It is also shown that the magnetoresistance ratio (MR) can be switched by the δ-doping. The underlying physical mechanism of the results is analysed in light of δ-doping-dependent tunneling process in the device.

  17. Optical tunability of magnetic polaron stability in single-Mn doped bulk GaAs and GaAs/AlGaAs quantum dots

    NASA Astrophysics Data System (ADS)

    Qu, Fanyao; Moura, Fábio Vieira; Alves, Fabrizio M.; Gargano, Ricardo


    Optical control of magnetic property of a magnetic polaron (MP) in Mn-doped bulk GaAs and GaAs/AlGaAs quantum dots (QDs) have been studied. We have developed basis optimization technique for the method of linear combination of atomic orbitals (LCAOs), which significantly improve the accuracy of the conventional LCAO calculation. We have demonstrated that a monochromatic, linearly polarized, intense pulsed laser field induces a collapse of the MP and an ionization of Mn-acceptor in Mn-doped GaAs materials due to a dichotomy of hole wave function. We find this optical tunability of MP stability can be adjusted by confinement introduced in GaAs QDs.

  18. Photoreflectance and surface photovoltage spectroscopy of beryllium-doped GaAs /AlAs multiple quantum wells

    NASA Astrophysics Data System (ADS)

    Čechavičius, B.; Kavaliauskas, J.; Krivaitė, G.; Seliuta, D.; Valušis, G.; Halsall, M. P.; Steer, M. J.; Harrison, P.


    We present an optical study of beryllium δ-doped GaAs /AlAs multiple quantum well (QW) structures designed for sensing terahertz (THz) radiation. Photoreflectance (PR), surface photovoltage (SPV), and wavelength-modulated differential surface photovoltage (DSPV) spectra were measured in the structures with QW widths ranging from 3to20nm and doping densities from 2×1010to5×1012cm-2 at room temperature. The PR spectra displayed Franz-Keldysh oscillations which enabled an estimation of the electric-field strength of ˜20kV/cm at the sample surface. By analyzing the SPV spectra we have determined that a buried interface rather than the sample surface mainly governs the SPV effect. The DSPV spectra revealed sharp features associated with excitonic interband transitions which energies were found to be in a good agreement with those calculated including the nonparabolicity of the energy bands. The dependence of the exciton linewidth broadening on the well width and the quantum index has shown that an average half monolayer well width fluctuations is mostly predominant broadening mechanism for QWs thinner than 10nm. The line broadening in lightly doped QWs, thicker than 10nm, was found to arise from thermal broadening with the contribution from Stark broadening due to random electric fields of the ionized impurities in the structures. We finally consider the possible influence of strong internal electric fields, QW imperfections, and doping level on the operation of THz sensors fabricated using the studied structures.

  19. Carrier compensation in semi-insulating CdTe: First-principles calculations

    SciTech Connect

    Du, Mao-Hua; Singh, David J


    Carrier compensation in semi-insulating CdTe has been attributed to the compensation of surplus shallow acceptors by deep donors, usually assumed to be Te antisites. However, our first-principles calculations show that intrinsic defects should not have a significant effect on the carrier compensation due either to lack of deep levels near midgap or to low defect concentration. We demonstrate that an extrinsic defect, OTe-H complex, may play an important role in the carrier compensation in CdTe because of its amphoteric character and reasonably high concentration. Our findings have important consequences for improving device performance in CdTe-based radiation detectors and solar cells.

  20. GaInP/GaAs tandem solar cells with highly Te- and Mg-doped GaAs tunnel junctions grown by MBE

    NASA Astrophysics Data System (ADS)

    Zheng, Xin-He; Liu, San-Jie; Xia, Yu; Gan, Xing-Yuan; Wang, Hai-Xiao; Wang, Nai-Ming; Yang, Hui


    We report a GaInP/GaAs tandem solar cell with a novel GaAs tunnel junction (TJ) with using tellurium (Te) and magnesium (Mg) as n- and p-type dopants via dual-filament low temperature effusion cells grown by molecular beam epitaxy (MBE) at low temperature. The test Te/Mg-doped GaAs TJ shows a peak current density of 21 A/cm2. The tandem solar cell by the Te/Mg TJ shows a short-circuit current density of 12 mA/cm2, but a low open-circuit voltage range of 1.4 V˜1.71 V under AM1.5 illumination. The secondary ion mass spectroscopy (SIMS) analysis reveals that the Te doping is unexpectedly high and its doping profile extends to the Mg doping region, thus possibly resulting in a less abrupt junction with no tunneling carriers effectively. Furthermore, the tunneling interface shifts from the intended GaAs n++/p++ junction to the AlGaInP/GaAs junction with a higher bandgap AlGaInP tunneling layers, thereby reducing the tunneling peak. The Te concentration of ˜ 2.5 × 1020 in GaAs could cause a lattice strain of 10-3 in magnitude and thus a surface roughening, which also negatively influences the subsequent growth of the top subcell and the GaAs contacting layers. The doping features of Te and Mg are discussed to understand the photovoltaic response of the studied tandem cell. Project supported by the SINANO-SONY Joint Program (Grant No. Y1AAQ11001), the National Natural Science Foundation of China (Grant No. 61274134), the USCB Start-up Program (Grant No. 06105033), and the International Cooperation Projects of Suzhou City, China (Grant No. SH201215).

  1. Doping and electronic properties of GaAs grown by close-spaced vapor transport from powder sources for scalable III–V photovoltaics

    SciTech Connect

    Ritenour, Andrew J.; Boucher, Jason W.; DeLancey, Robert; Greenaway, Ann L.; Aloni, Shaul; Boettcher, Shannon W.


    We report the use of a simple close-spaced vapor transport technique for the growth of high-quality epitaxial GaAs films using potentially inexpensive GaAs powders as precursors. The free carrier type and density (1016 to 1019 cm–3) of the films were adjusted by addition of Te or Zn powder to the GaAs source powder. We show using photoelectrochemical and electron beam-induced current analyses that the minority carrier diffusion lengths of the n- and p-GaAs films reached ~3 μm and ~8 μm, respectively. Hall mobilities approach those achieved for GaAs grown by metal–organic chemical vapor deposition, 1000–4200 cm2 V–1 s–1 for n-GaAs and 50–240 cm V–1 s–1 for p-GaAs depending on doping level. We conclude that the electronic quality of GaAs grown by close-spaced vapor transport is similar to that of GaAs made using conventional techniques and is thus sufficient for high-performance photovoltaic applications.

  2. Doping and electronic properties of GaAs grown by close-spaced vapor transport from powder sources for scalable III–V photovoltaics


    Ritenour, Andrew J.; Boucher, Jason W.; DeLancey, Robert; Greenaway, Ann L.; Aloni, Shaul; Boettcher, Shannon W.


    We report the use of a simple close-spaced vapor transport technique for the growth of high-quality epitaxial GaAs films using potentially inexpensive GaAs powders as precursors. The free carrier type and density (1016 to 1019 cm–3) of the films were adjusted by addition of Te or Zn powder to the GaAs source powder. We show using photoelectrochemical and electron beam-induced current analyses that the minority carrier diffusion lengths of the n- and p-GaAs films reached ~3 μm and ~8 μm, respectively. Hall mobilities approach those achieved for GaAs grown by metal–organic chemical vapor deposition, 1000–4200 cm2 V–1 s–1 for n-GaAsmore » and 50–240 cm V–1 s–1 for p-GaAs depending on doping level. We conclude that the electronic quality of GaAs grown by close-spaced vapor transport is similar to that of GaAs made using conventional techniques and is thus sufficient for high-performance photovoltaic applications.« less

  3. Ab initio study of the strain dependent thermodynamics of Bi doping in GaAs

    NASA Astrophysics Data System (ADS)

    Jacobsen, Heather; Puchala, Brian; Kuech, Thomas F.; Morgan, Dane


    The thermodynamics of Bi incorporation into bulk and epitaxial GaAs was studied using density functional theory (DFT) and anharmonic elasticity calculations. The equilibrium concentration of Bi was determined as a function of epitaxial strain state, temperature, and growth conditions. For a bulk, unstrained system, Bi in GaAs under typical growth conditions (Ga-rich and Bi-metal-rich at 400 °C) has a dilute heat of solution of 572 meV/Bi and a solubility of x=5.2×10-5 in GaAs1-xBix. However, epitaxial strain can greatly enhance this solubility, and under the same conditions an epitaxial film of GaAs1-xBix with 5% in-plane tensile strain is predicted to have a Bi solubility of x=7.3×10-3, representing approximately a hundred times increase in solubility over the unstrained bulk case. Despite these potentially large increases in solubility, the equilibrium solubility is still very low compared to values that have been achieved experimentally through nonequilibrium growth. These values of solubility are also sensitive to the choice of the Bi reference state. If the primary route for phase separation is the formation of GaBi within the same structure, rather than Bi metal, GaBi would serve as the source/sink for Bi. If GaBi is used as the Bi reference state, the epitaxial formation energy on a bulk unstrained GaAs substrate is reduced dramatically to 144 meV/Bi, yielding a Bi solubility of x=0.083 in GaAs1-xBix. These calculations suggest that Bi solubility could be greatly enhanced if Bi metal formation is inhibited and the system is forced to remain constrained to the GaAs1-xBix structure. Although GaBi is not a naturally stable compound, it could potentially be stabilized through a combination of kinetic limitations and alloying.

  4. Design Issues of GaAs and AlGaAs Delta-Doped p-i-n Quantum-Well APD's

    NASA Technical Reports Server (NTRS)

    Wang, Yang


    We examine the basic design issues in the optimization of GaAs delta-doped and AlGAs delta-doped quantum-well avalanche photodiode (APD) structures using a theoretical analysis based on an ensemble Monte Carlo simulation. The devices are variations of the p-i-n doped quantum-well structure previously described in the literature. They have the same low-noise, high-gain and high-bandwidth features as the p-i-n doped quantum-well device. However, the use of delta doping provides far greater control or the doping concentrations within each stage possibly enhancing the extent to which the device can be depleted. As a result, it is expected that the proposed devices will operate at higher gain levels (at very low noise) than devices previously developed.

  5. Photoreflectance analysis of annealed vanadium-doped GaAs thin films grown by metalorganic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Fitouri, H.; Bilel, C.; Zaied, I.; Bchetnia, A.; Rebey, A.; El Jani, B.


    In this study, we investigate the optical properties of annealed vanadium-doped GaAs films grown on GaAs substrates by metalorganic vapor phase epitaxy. The temperature dependence of the photoreflectance (PR) of as-grown GaAs:V films has been studied. We used the fit with Third-Derivative Functional Form model to evaluate the physical parameters. The temperature dependence of band gap and spin-orbit energies can be described by the Bose-Einstein statistical expression. The PR spectra of the samples are measured after thermal annealing in order to check any improvement in the optical quality of the material. The PR signal amplitude of GaAs:V samples decreased after thermal annealing. Degradation of the PR signal for annealing temperature at about 850 °C is observed revealing a poor quality of the layer surface states and an important density of the recombination centers. The lock-in phase analysis of PR spectra allows to determine the time constant for GaAs:V sample before and after thermal annealing.

  6. First Principles Electronic Structure of Mn doped GaAs, GaP, and GaN Semiconductors

    SciTech Connect

    Schulthess, Thomas C; Temmerman, Walter M; Szotek, Zdzislawa; Svane, Axel; Petit, Leon


    We present first-principles electronic structure calculations of Mn doped III-V semiconductors based on the local spin-density approximation (LSDA) as well as the self-interaction corrected local spin density method (SIC-LSD). We find that it is crucial to use a self-interaction free approach to properly describe the electronic ground state. The SIC-LSD calculations predict the proper electronic ground state configuration for Mn in GaAs, GaP, and GaN. Excellent quantitative agreement with experiment is found for magnetic moment and p-d exchange in (GaMn)As. These results allow us to validate commonly used models for magnetic semiconductors. Furthermore, we discuss the delicate problem of extracting binding energies of localized levels from density functional theory calculations. We propose three approaches to take into account final state effects to estimate the binding energies of the Mn-d levels in GaAs. We find good agreement between computed values and estimates from photoemisison experiments.

  7. Comparison of OARE Accelerometer Data with Dopant Distribution in Se-Doped GaAs Crystals Grown During USML-1

    NASA Technical Reports Server (NTRS)

    Moskowitz, Milton E.; Bly, Jennifer M.; Matthiesen, David H.


    Experiments were conducted in the crystal growth furnace (CGF) during the first United States Microgravity Laboratory (USML-1), the STS-50 flight of the Space Shuttle Columbia, to determine the segregation behavior of selenium in bulk GaAs in a microgravity environment. After the flight, the selenium-doped GaAs crystals were sectioned, polished, and analyzed to determine the free carrier concentration as a function of position, One of the two crystals initially exhibited an axial concentration profile indicative of diffusion controlled growth, but this profile then changed to that predicted for a complete mixing type growth. An analytical model, proposed by Naumann [R.J. Naumann, J. Crystal Growth 142 (1994) 253], was utilized to predict the maximum allowable microgravity disturbances transverse to the growth direction during the two different translation rates used for each of the experiments. The predicted allowable acceleration levels were 4.86 microgram for the 2.5 micrometers/s furnace translation rate and 38.9 microgram for the 5.0 micrometers/s rate. These predicted values were compared to the Orbital Acceleration Research Experiment (OARE) accelerometer data recorded during the crystal growth periods for these experiments. Based on the analysis of the OARE acceleration data and utilizing the predictions from the analytical model, it is concluded that the change in segregation behavior was not caused by any acceleration events in the microgravity environment.

  8. Evaluation of modulating field of photoreflectance of surface-intrinsic-n+ type doped GaAs by using photoinduced voltage

    NASA Astrophysics Data System (ADS)

    Lee, W. Y.; Chien, J. Y.; Wang, D. P.; Huang, K. F.; Huang, T. C.


    Photoreflectance (PR) of surface-intrinsic-n+ type doped GaAs has been measured for various power densities of pump laser. The spectra exhibited many Franz-Keldysh oscillations, whereby the strength of electric field F in the undoped layer can be determined. The thus obtained Fs are subject to photovoltaic effect and are less than built-in field Fbi. In the previous work we have obtained the relation F≈Fbi-δF/2 when δF≪Fbi by using electroreflectance to simulate PR, where δF is the modulating field of the pump beam. In this work a method was devised to evaluate δF by using photoinduced voltages Vs and, hence, the relation can be verified by PR itself. The δFs obtained by Vs are also consistent with those of using imaginary part of fast Fourier transform of PR spectra.

  9. Design and fabrication of GaAs OMIST photodetector

    NASA Astrophysics Data System (ADS)

    Kang, Xuejun; Lin, ShiMing; Liao, Qiwei; Gao, Junhua; Liu, Shi'an; Cheng, Peng; Wang, Hongjie; Zhang, Chunhui; Wang, Qiming


    We designed and fabricated GaAs OMIST (Optical-controlled Metal-Insulator-Semiconductor Thyristor) device. Using oxidation of AlAs layer that is grown by MBE forms the Ultra- Thin semi-Insulating layer (UTI) of the GAAS OMIST. The accurate control and formation of high quality semi-insulating layer (AlxOy) are the key processes for fabricating GaAs OMIST. The device exhibits a current-controlled negative resistance region in its I-V characteristics. When illuminated, the major effect of optical excitation is the reduction of the switching voltage. If the GaAs OMIST device is biased at a voltage below its dark switching voltage Vs, sufficient incident light can switch OMIST from high impedance low current 'off' state to low impedance high current 'on' state. The absorbing material of OMIST is GaAS, so if the wavelength of incident light within 600 to approximately 850 nm can be detected effectively. It is suitable to be used as photodetector for digital optical data process. The other attractive features of GaAs OMIST device include suitable conducted current, switching voltage and power levels for OEIC, high switch speed and high sensitivity to light or current injection.

  10. Raman study of As outgassing and damage induced by ion implantation in Zn-doped GaAs

    SciTech Connect

    Barba, D.; Aimez, V.; Beauvais, J.; Beerens, J.; Drouin, D.; Chicoine, M.; Schiettekatte, F.


    Room temperature micro-Raman investigations of LO phonon and LO phonon-plasmon coupling is used to study the As outgassing mechanism and the disordering effects induced by ion implantation in Zn-doped GaAs with nominal doping level p=7x10{sup 18} cm{sup -3}. The relative intensity of these two peaks is measured right after rapid vacuum thermal annealings (RVTA) between 200 and 450 deg. C, or after ion implantations carried out at energies of 40 keV with P{sup +}, and at 90 and 170 keV with As{sup +}. These intensities provide information regarding the Schottky barrier formation near the sample surface. Namely, the Raman signature of the depletion layer formation resulting from As desorption is clearly observed in samples submitted to RVTA above 300 deg. C, and the depletion layer depths measured in ion implanted GaAs:Zn are consistent with the damage profiles obtained through Monte Carlo simulations. Ion channeling effects, maximized for a tilt angle set to 45 deg. during implantation, are also investigated. These results show that the Raman spectroscopy is a versatile tool to study the defects induced by postgrowth processes in multilayered heterostructures, with probing range of about 100 nm in GaAs-based materials.

  11. Structural and magnetic characteristics of MnAs nanoclusters embedded in Be-doped GaAs

    NASA Astrophysics Data System (ADS)

    Rench, D. W.; Schiffer, P.; Samarth, N.


    We describe a systematic study of the synthesis, microstructure, and magnetization of hybrid ferromagnet-semiconductor nanomaterials comprised of MnAs nanoclusters embedded in a p-doped GaAs matrix. These samples are created during the in situ annealing of Be-doped (Ga,Mn)As heterostructures grown by molecular beam epitaxy. Transmission electron microscopy and magnetometry studies reveal two distinct classes of nanoclustered samples whose structural and magnetic properties depend on the Mn content of the initial (Ga,Mn)As layer. For Mn content in the range 5-7.5%, annealing creates a superparamagnetic material with a uniform distribution of small clusters (diameter ˜6 nm) and with a low blocking temperature (TB˜10 K). While transmission electron microscopy cannot definitively identify the composition and crystalline phase of these small clusters, our experimental data suggest that they may be comprised of either zinc-blende MnAs or Mn-rich regions of (Ga,Mn)As. At higher Mn content (≳8%), we find that annealing results in an inhomogeneous distribution of both small clusters as well as much larger NiAs-phase MnAs clusters (diameter ˜25 nm). These samples also exhibit supermagnetism, albeit with substantially larger magnetic moments and coercive fields, and blocking temperatures well above room temperature.

  12. Selfsimilar and fractal analysis of n-type delta-doped quasiregular GaAs quantum wells

    SciTech Connect

    García-Cervantes, H.; Rodríguez-Vargas, I.


    We study the electronic structure of n-type delta-doped quantum wells in GaAs in which the multiple well system is built according to the Fibonacci sequence. The building blocks A and B correspond to delta-doped wells with impurities densities n{sub 2DA} and n{sub 2DB}, and the same well width. The Thomas-Fermi approximation, the semi-empirical sp{sub 3}s* tight-binding model including spin, the Surface Green Function Matching method and the Transfer Matrix approach were implemented to obtain the confining potential, the electronic structure and the selfsimilarity of the spectrum. The fragmentation of the electronic spectra is observed whenever the building blocks A and B interact and it increases as the difference of impurities density between A and B increases as well. The wave function of the first sate of the fragmented bands presents critical characteristics, this is, it is not a localized state nor a extended one as well as it has selfsimilar features. So, the quasiregular characteristics are preserved irrespective of the complexity of the system and can affect the performance of devices based on these structures.

  13. Mechanisms of the passage of dark currents through Cd(Zn)Te semi-insulating crystals

    NASA Astrophysics Data System (ADS)

    Sklyarchuk, V.; Fochuk, P.; Rarenko, I.; Zakharuk, Z.; Sklyarchuk, O.; Nykoniuk, Ye.; Rybka, A.; Kutny, V.; Bolotnikov, A. E.; James, R. B.


    We investigated the passage of dark currents through semi-insulating crystals of Cd(Zn)Te with weak n-type conductivity that are used widely as detectors of ionizing radiation. The crystals were grown from a tellurium solution melt at 800 оС by the zone-melting method, in which a polycrystalline rod in a quartz ampoule was moved through a zone heater at a rate of 2 mm per day. The synthesis of the rod was carried out at ~1150 оС. We determined the important electro-physical parameters of this semiconductor, using techniques based on a parallel study of the temperature dependence of current-voltage characteristics in both the ohmic and the space-charge-limited current regions. We established in these crystals the relationship between the energy levels and the concentrations of deep-level impurity states, responsible for dark conductivity and their usefulness as detectors.

  14. The role of hydrogen in semi-insulating InP

    SciTech Connect

    Han, Y.; Liu, X.; Jiao, J.; Qian, J.; Chen, Y.; Wang, Z.; Lin, L.


    Complexes of vacancy at indium site with one to four hydrogen atoms and isolated hydrogen or hydrogen dimer and other infrared absorption lines, tentatively be assigned to hydrogen related defects were investigated by FTIR. Hydrogen can passivate imperfections, thereby eliminating detrimental electronic states from the energy bandgap. Incorporated hydrogen can introduce extended defects and generate electrically-active defects. Hydrogen also can act as an actuator for creating antistructure defects. Isolated hydrogen related defects (e.g., H{sub 2}{sup *}) may play an important role in the conversion of the annealed wafers from semiconducting to the semi-insulating behavior. H{sub 2}{sup *} may be a deep donor, whose energy level is very near the iron deep acceptor level in the energy gap.

  15. Simulation of Electric Field in Semi Insulating Au/CdTe/Au Detector under Flux

    SciTech Connect

    Franc, J.; James, R.; Grill, R.; Kubat, J.; Belas, E.; Hoschl, P.; Moravec, P.; Praus, P.


    We report our simulations on the profile of the electric field in semi insulating CdTe and CdZnTe with Au contacts under radiation flux. The type of the space charge and electric field distribution in the Au/CdTe/Au structure is at high fluxes result of a combined influence of charge formed due to band bending at the electrodes and from photo generated carriers, which are trapped at deep levels. Simultaneous solution of drift-diffusion and Poisson equations is used for the calculation. We show, that the space charge originating from trapped photo-carriers starts to dominate at fluxes 10{sup 15}-10{sup 16}cm{sup -2}s{sup -1}, when the influence of contacts starts to be negligible.

  16. The influence of Sb doping on the growth and electronic properties of GaAs(100) and AlGaAs(100)

    NASA Technical Reports Server (NTRS)

    Jamison, K. D.; Chen, H. C.; Bensaoula, A.; Lim, W.; Trombetta, L.


    Isoelectronic doping using antimony has been shown to reduce traps and improve material properties during epitaxial growth of Si doped GaAs(100) and AlGaAs(100). In this study, the effect of the antimony dopant on the optimal growth temperature is examined with the aim of producing high-quality heterostructures at lower temperatues. High-quality films of GaAs and AlGaAs have been grown by molecular-beam epitaxy at the normal growth temperatures of 610 and 700 C, respectively, and 50-100 C below this temperature using varying small amounts of Sb as a dopant. Electrical properties of the films were then examined using Hall mobility measurements and deep-level transient spectroscopy.

  17. Low defect densities in molecular beam epitaxial GaAs achieved by isoelectronic In doping

    NASA Technical Reports Server (NTRS)

    Bhattacharya, P. K.; Dhar, S.; Berger, P.; Juang, F.-Y.


    A study has been made of the effects of adding small amounts of In (0.2-1.2 pct) to GaAs grown by molecular beam epitaxy. The density of four electron traps decreases in concentration by an order of magnitude, and the peak intensities of prominent emissions in the excitonic spectra are reduced with increase in In content. Based on the higher surface migration rate of In, compared to Ga, at the growth temperatures it is apparent that the traps and the excitonic transitions are related to point defects. This agrees with earlier observations by Briones and Collins (1982) and Skromme et al. (1985).

  18. Microscopic defect level characterization of semi-insulating compound semiconductors by TSC and PICTS. Application to the effect of hydrogen in CdTe

    NASA Astrophysics Data System (ADS)

    Hage-Ali, M.; Yaacoub, B.; Mergui, S.; Samimi, M.; Biglari, B.; Siffert, P.


    Thermally stimulated current (TSC) and photo-induced current transient spectroscopy (PICTS) methods have been developed for the microscopic defect characterization in semi-insulating compound semiconductors. The capabilities of these methods are demonstrated by investigating the effects of hydrogen implantation or diffusion into semi-insulating cadmium telluride.

  19. Compensation mechanism in liquid encapsulated Czochralski GaAs Importance of melt stoichiometry

    NASA Technical Reports Server (NTRS)

    Holmes, D. E.; Chen, R. T.; Elliott, K. R.; Kirkpatrick, C. G.; Yu, P. W.


    It is shown that the key to reproducible growth of undoped semi-insulating GaAs by the liquid encapsulated Czochralski (LEC) technique is the control over the melt stoichiometry. Twelve crystals were grown from stoichiometric and nonstoichiometric melts. The material was characterized by secondary ion mass spectrometry, localized vibrational mode far infrared spectroscopy, Hall-effect measurements, optical absorption, and photoluminescence. A quantitative model for the compensation mechanism in the semi-insulating material was developed based on these measurements. The free carrier concentration is controlled by the balance between EL2 deep donors and carbon acceptors; furthermore, the incorporation of EL2 is controlled by the melt stoichiometry, increasing as the As atom fraction in the melt increases. As a result, semi-insulating material can be grown only from melts above a critical As composition. The practical significance of these results is discussed in terms of achieving high yield and reproducibility in the crystal growth process.

  20. Development of bulk GaAs room temperature radiation detectors

    SciTech Connect

    McGregor, D.S.; Knoll, G.F. . Dept. of Nuclear Engineering); Eisen, Y. . Soreq Nuclear Research Center); Brake, R. )


    This paper reports on GaAs, a wide band gap semiconductor with potential use as a room temperature radiation detector. Various configurations of Schottky diode detectors were fabricated with bulk crystals of liquid encapsulated Czochralski (LEC) semi-insulating undoped GaAs material. Basic detector construction utilized one Ti/Au Schottky contact and one Au/Ge/Ni alloyed ohmic contact. Pulsed X-ray analysis indicated pulse decay times dependent on bias voltage. Pulse height analysis disclosed non-uniform electric field distributions across the detectors tentatively explained as a consequence of native deep level donors (EL2) in the crystal.

  1. Lattice expansion, stability, and Mn solubility in substitutionally Mn-doped GaAs

    NASA Astrophysics Data System (ADS)

    Nakamura, Kohji; Hatano, Keishi; Akiyama, Toru; Ito, Tomonori; Freeman, A. J.


    The structural properties and stability of zinc-blende GaxMn1-xAs over the whole Mn composition range are studied by means of the highly precise full-potential linearized augmented plane-wave method and the Connolly-Williams cluster expansion method, within the local-density approximation (LDA), generalized gradient approximation (GGA), and LDA+U . In contrast to LDA and GGA predictions, the calculated LDA+U lattice constant is found to increase when the Mn composition increases, even in the case that the Mn atoms substitutionally occupy cation sites, due to the correlation correction of the pd hybridization strength between the Mn3d bands and the As4p valence bands, which agrees with recent experimental findings. In addition, we confirm that the system has a tendency to segregate into GaAs and MnAs, and so inherently favors clustering. A temperature-composition phase diagram is obtained with the mean-field approximation for the entropy, in which the Mn solubility into GaAs is found to be very low at low temperatures (˜300°C) .

  2. Infrared absorption related to the metastable state of arsenic antisite defects in electron-irradiated GaAs

    SciTech Connect

    Kuisma, S.; Saarinen, K.; Hautojaervi, P.; Corbel, C.


    A metastable irradiation-induced vacancy is detected by positrons in semi-insulating GaAs. The vacancy is associated with the metastable state of an irradition-induced As-antisite-related defect. This metastable state absorbs IR light in contrast to the metastable state of the As-antisite-related native EL2 defect. This property can be explained by the presence of other defects complexed with the As antisite in electron-irradiated GaAs.

  3. Highly efficient and electrically robust carbon irradiated semi-insulating GaAs based photoconductive terahertz emitters

    SciTech Connect

    Singh, Abhishek; Pal, Sanjoy; Surdi, Harshad; Prabhu, S. S. Nanal, Vandana; Pillay, R. G.


    We demonstrate here an efficient photoconductive THz source with low electrical power consumption. We have increased the maximum THz radiation power emitted from SI-GaAs based photoconductive emitters (PCEs) by two orders of magnitude. By irradiating the SI-GaAs substrate with Carbon-ions up to 2 μm deep, we have created lot of defects and decreased the lifetime of photo-excited carriers inside the substrate. Depending on the irradiation dose, we find 1 to 2 orders of magnitude decrease in total current flowing in the substrate, resulting in subsequent decrease of heat dissipation in the device. This has resulted in increasing maximum cut-off of the applied voltage across PCE electrodes to operate the device without thermal breakdown from ∼35 V to >150 V for the 25 μm electrode gaps. At optimum operating conditions, carbon irradiated (10{sup 14} ions/cm{sup 2}) PCEs give THz pulses with power about 100 times higher in comparison to the usual PCEs on SI-GaAs and electrical to THz power conversion efficiency has improved by a factor of ∼800.

  4. Heat load of a P-doped GaAs photocathode in SRF electron gun

    SciTech Connect

    Wang, E.; Ben-Zvi, I.; Kewisch, J.; Burrill, A.; Rao, T.; Wu, Q.; Jain, A.; Gupta, R.; Holmes, D.


    Many efforts were made over the last decades to develop a better polarized electron source for the high energy physics. Several laboratories operate DC guns with the Gallium-Arsenide photo-cathode, which yield a highly polarized electron beam. However, the beam's emittance might well be improved using a Superconducting RF electron gun, which delivers beams of higher brightness than DC guns does, because the field gradient at the cathode is higher. SRF guns with metal cathodes and CsTe cathodes have been tested successfully. To produce polarized electrons, a Gallium-Arsenide photo-cathode must be used: an experiment to do so in a superconducting RF gun is under way at BNL. Since the cathode will be normal conducting, the problem about the heat load stemming from the cathode arises. We present our measurements of the electrical resistance of GaAs at cryogenic temperatures, a prediction of the heat load and the verification by measuring the quality factor of the gun with and without cathode.

  5. GaAs Self-Aligned JFETS with Carbon-Doped P+ Region

    SciTech Connect

    Allerman, A.A.; Baca, A.G.; Chang, P.C.; Drummond, T.J.


    Self-aligned JFETs with a carbon-doped p{sup +} region have been reported for the first time. For these JFETs, both the channel and p{sup +} region were grown by metal organic chemical vapor deposition (MOCVD) and are termed epitaxial JFETs in this study. The epitaxial JFETs were compared to ion implanted JFETs of similar channel doping and threshold voltage. Both JFETs were fabricated using the same self-aligned process for doping the source and drain regions of the JFET and for eliminating excess gate capacitance of conventional JFETs. The gate turn-on voltage for the epitaxial JFETs was 1.06 V, about 0.1 V higher than for the implanted JFETs. The reverse breakdown voltage was similar for both JFETs but the reverse gate leakage current of the epitaxial JFETs was 1-3 orders of magnitude less than the implanted JFETs. The epitaxial JFETs also showed higher transconductance and lower knee voltage than the implanted JFETs.

  6. Hydrogen sulphide doping of GaAs and AlxGa1-xAs grown by molecular beam epitaxy (MBE)

    NASA Astrophysics Data System (ADS)

    Briones, F.; Golmayo, D.; González, L.; de Miguel, J. L.


    H2S gas has been used during molecular beam epitaxy (MBE) growth of GaAs and Al x Ga1- x As as sulphur vector for n-type doping. Doping efficiencies are less than 10-3 at usual growth temperatures, and are limited by an incorporation competitive surface process, probably 2Ga+H2S→Ga2S+H2. In AlxGa1- x As for x≧0.2 the doping efficiency is further reduced by carrier freeze-out at deep levels. Measured thermal activation energies depend on growth conditions and remain relatively low even up to the direct-indirect bandgap crossover for substrate temperatures in the 585 645 ‡C range.

  7. Dislocation lines in indium-doped GaAs crystals observed by infrared light scattering tomography of about 1 μm wavelength radiation

    NASA Astrophysics Data System (ADS)

    Ogawa, Tomoya


    Decorated dislocation lines in GaAs crystals are remarkably well observed by scattering of an infrared laser beam in the 1 μm wavelength range. Some of these dislocation lines are also observed by absorption imaging in the same wavelength region but others are only detected by light scattering. Furthermore, the former lines correspond to the pits etched by molten KOH. Dislocation lines in In-doped GaAs crystals grown by the LEC method from nearly stoichiometric melts are studied in connection with their growth history, where grown-in dislocation lines are bent at growth interfaces to react with each other and then their density is decreased. At the shoulder part of the ingots, many slip dislocations are found, where most dislocation lines are so isolated that they are clearly and individually observed by light scattering tomography without etching.

  8. Fabrication of Ohmic contact on semi-insulating 4H-SiC substrate by laser thermal annealing

    NASA Astrophysics Data System (ADS)

    Cheng, Yue; Lu, Wu-yue; Wang, Tao; Chen, Zhi-zhan


    The Ni contact layer was deposited on semi-insulating 4H-SiC substrate by magnetron sputtering. The as-deposited samples were treated by rapid thermal annealing (RTA) and KrF excimer laser thermal annealing (LTA), respectively. The RTA annealed sample is rectifying while the LTA sample is Ohmic. The specific contact resistance (ρc) is 1.97 × 10-3 Ω.cm2, which was determined by the circular transmission line model. High resolution transmission electron microscopy morphologies and selected area electron diffraction patterns demonstrate that the 3C-SiC transition zone is formed in the near-interface region of the SiC after the as-deposited sample is treated by LTA, which is responsible for the Ohmic contact formation in the semi-insulating 4H-SiC.

  9. Characteristic of photocurrent decline of transmission-mode equally doped GaAs photocathode

    NASA Astrophysics Data System (ADS)

    Zhang, Dong Lian; Shi, Feng; Gao, Xiang; Cheng, Hong-Chang; Miao, Zhuang; Niu, Sen; Wang, Long; Chen, Chang


    Photocurrent of GaAs photocathode activated with Cs and O was tested by auto-activation monitor, the fitting curves of photocurrent showed that the photocurrent of the photocathode after the first activation declines exponentially, and then declines linearly with very small slope |k1|; the photocurrent after the second activation rises exponentially, and then declines linearly with a slope|k2| which is a bit larger than |k1|.Based on the mechanism difference between twice annealing of the photocathode, the degeneration behavior of the photocathode was analyzed by three-dipoles model and XPS test after the first activation and succedent thermal cleaning. It is indicated that Cs2O dipoles on the surface are saturated after the photocathode was activated for the first time, the remained Cs and Cs2O in the ultra-high vacuum chamber which deposited on the photocathode surface will prevent the emission of photoelectrons. The photocathode surface with Cs and O reconstructed when it was annealing for the second time, a lot of Cs2O dipoles changed into more stable GaAs-O-Cs dipoles, and this phenomenon would happened immediately as soon as the photocathode was activating for the second time. After the residual Cs and Cs2O dipoles depleted, the neutral gas CO2, H2O, O2, damaging the surface dipoles layer, are the main factors resulted in the decline of photocurrent. Due to the instable Cs2O dipoles on the surface of photocathode have greater chances of converting into stable GaAs-O-Cs dipoles when photocathode was activated for the first time, the photocurrent declines more slowly compared with the second activation. The discussion for the phenomenon is of great significance for exploring the photoemission mechanism of Ⅲ-Ⅴ semiconductors.

  10. Cathodoluminescence of Yellow and Blue Luminescence in Undoped Semi-insulating GaN and n-GaN

    NASA Astrophysics Data System (ADS)

    Hou, Qi-Feng; Wang, Xiao-Liang; Xiao, Hong-Ling; Wang, Cui-Mei; Yang, Cui-Bai; Yin, Hai-Bo; Li, Jin-Min; Wang, Zhan-Guo


    Yellow and blue luminescence in undoped GaN layers with different resistivities are studied by cathodoluminescence. Intense yellow and blue luminescence bands are observed in semi-insulating GaN, while in n-GaN the yellow luminescence and blue luminescence bands are very weak. The stronger yellow and blue luminescences in semi-insulating GaN are correlated to the higher edge-type dislocation density. The scanning cathodoluminescence image reveals strong defect-related luminescence at the grain boundaries where the dislocations accumulate. It is found that the relative intensity of the blue luminescence band to the yellow luminescence band increases with the cathodoluminescence beam energies and is larger in n-GaN with a lower density of edge-type dislocations. An approximately 3.35 eV shoulder next to the near-band-edge peak is observed in n-GaN but not in semi-insulating GaN. A redshift of the near-band-edge peak with cathodoluminescence beam energy is observed in both samples and is explained by internal absorption.

  11. Growth studies of erbium-doped GaAs deposited by metalorganic vapor phase epitaxy using noval cyclopentadienyl-based erbium sources

    NASA Technical Reports Server (NTRS)

    Redwing, J. M.; Kuech, T. F.; Gordon, D. C.; Vaartstra, B. A.; Lau, S. S.


    Erbium-doped GaAS layers were grown by metalorganic vapor phase epitaxy using two new sources, bis(i-propylcyclopentadienyl)cyclopentadienyl erbium and tris(t-butylcyclopentadienyl) erbium. Controlled Er doping in the range of 10(exp 17) - 10(exp 18)/cu cm was achieved using a relatively low source temperature of 90 C. The doping exhibits a second-order dependence on inlet source partial pressure, similar to behavior obtained with cyclopentadienyl Mg dopant sources. Equivalent amounts of oxygen and Er are present in 'as-grown' films indicating that the majority of Er dopants probably exist as Er-O complexes in the material. Er(+3) luminescence at 1.54 micrometers was measured from the as-grown films, but ion implantation of additional oxygen decreases the emission intensity. Electrical compensation of n-type GaAs layers codoped with Er and Si is directly correlated to the Er concentration is proposed to arise from the deep centers associated with Er which are responsible for a broad emission band near 0.90 micrometers present in the photoluminescence spectra of GaAs:Si, Er films.

  12. Plasma Deposited SiO2 for Planar Self-Aligned Gate Metal-Insulator-Semiconductor Field Effect Transistors on Semi-Insulating InP

    NASA Technical Reports Server (NTRS)

    Tabory, Charles N.; Young, Paul G.; Smith, Edwyn D.; Alterovitz, Samuel A.


    Metal-insulator-semiconductor (MIS) field effect transistors were fabricated on InP substrates using a planar self-aligned gate process. A 700-1000 A gate insulator of Si02 doped with phosphorus was deposited by a direct plasma enhanced chemical vapor deposition at 400 mTorr, 275 C, 5 W, and power density of 8.5 MW/sq cm. High frequency capacitance-voltage measurements were taken on MIS capacitors which have been subjected to a 700 C anneal and an interface state density of lxl0(exp 11)/eV/cq cm was found. Current-voltage measurements of the capacitors show a breakdown voltage of 107 V/cm and a insulator resistivity of 10(exp 14) omega cm. Transistors were fabricated on semi-insulating InP using a standard planar self-aligned gate process in which the gate insulator was subjected to an ion implantation activation anneal of 700 C. MIS field effect transistors gave a maximum extrinsic transconductance of 23 mS/mm for a gate length of 3 microns. The drain current drift saturated at 87.5% of the initial current, while reaching to within 1% of the saturated value after only 1x10(exp 3). This is the first reported viable planar InP self-aligned gate transistor process reported to date.

  13. Magnesium doping of efficient GaAs and Ga(0.75)In(0.25)As solar cells grown by metalorganic chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Lewis, C. R.; Ford, C. W.; Werthen, J. G.


    Magnesium has been substituted for zinc in GaAs and Ga(0.75)In(0.25)As solar cells grown by metalorganic chemical vapor deposition (MOCVD). Bis(cyclopentadienyl)magnesium (Cp2Mg) is used as the MOCVD transport agent for Mg. Full retention of excellent material quality and efficient cell performance results. The substitution of Mg for Zn would enhance the abruptness and reproducibility of doping profiles, and facilitate high temperature processing and operation, due to the much lower diffusion coefficient of Mg, relative to Zn, in these materials.

  14. On the growth mechanism of Li- and Na-doped Zn chalcogenides on GaAs(001) by means of molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Ohishi, M.; Yoneta, M.; Ishii, S.; Ohura, M.; Hiroe, Y.; Saito, H.


    Sharp and semicircular patterns were observed in RHEED during the MBE growth of Li- or Na-acceptor doped ZnSe and ZnS on GaAs(001). The radius and the separation between the diffraction circles vary with the change of the azimuth of the incident electron beam. Calculated diffraction patterns assuming that Li or Na atoms are arrayed one-dimensionally along the [110] direction of the crystal axis are in good agreement with the experimental results. We conclude that Li or Na atoms are incorporated at the [110] terrace steps, which prevents the further growth from the step edge.

  15. Investigation of the optical properties of GaAs with δ-Si doping grown by molecular-beam epitaxy at low temperatures

    SciTech Connect

    Lavrukhin, D. V. Yachmenev, A. E.; Bugaev, A. S.; Galiev, G. B.; Klimov, E. A.; Khabibullin, R. A.; Ponomarev, D. S.; Maltsev, P. P.


    Molecular-beam epitaxy is used for the preparation of structures based on “low-temperature” grown GaAs with introduced d-Si doping. Specific features in the photon-energy range of 1.28–1.48 eV are observed in the photoluminescence spectrum after structures annealing at temperatures of 520 and 580°C; these features are related to the formation of point defects and their complexes. The “pump–probe” light transmission measurements reveal that the characteristic lifetimes of nonequilibrium carriers in the fabricated structures amount to T{sup c} ≈ 1.2–1.5 ps.

  16. High purity liquid phase epitaxial GaAs for radiation detectors

    SciTech Connect

    Wynne, D.I.; Haller, E.E.; Rossington Tull, C.S.


    The authors report on the growth of high purity n-GaAs using Liquid Phase Epitaxy (LPE) and the fabrication of room temperature p-i-n radiation detectors. The epilayers are grown from a Ga solvent in a graphite boat in a pure hydrogen atmosphere. Growth is started at a temperature of approximately 800 C. The best epilayers show a net-residual-donor concentration of 2 {times} 10{sup 13} cm{sup {minus}3}, confirmed by Hall effect measurements. The residual donors have been analyzed by far infrared spectroscopy and found to be sulfur and silicon. Epilayers with thicknesses of up to 120 {micro}m have been deposited on 650 {micro}m thick semi-insulating GaAs substrates and on 500 {micro}m thick n{sup +}-type GaAs substrates. The authors report the results obtained with Schottky barrier diodes fabricated from these high purity n-type GaAs epilayers and operated as X-ray detectors. The Schottky barrier contacts consisted of evaporated circular gold contacts on epilayers on n{sup +} substrates. The ohmic contacts were formed by evaporated and alloyed Ni-Ge-Au films on the back of the substrate. Several of the diodes exhibit currents of the order of 1 to 10 nA at reverse biases depleting approximately 50 {micro}m of the epilayer. This very encouraging result, demonstrating the possibility for fabricating GaAs p-i-n diodes with depletion layers in high purity GaAs instead of semi-insulating GaAs, is supported by similar results obtained by several other groups. The consequences of using high purity instead of semi-insulating GaAs will be much reduced charge carrier trapping. Diode electrical characteristics and detector performance results using {sup 55}Fe and {sup 241}Am radiation will be discussed.

  17. Selective-area growth of heavily n-doped GaAs nanostubs on Si(001) by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Chang, Yoon Jung; Simmonds, Paul J.; Beekley, Brett; Goorsky, Mark S.; Woo, Jason C. S.


    Using an aspect ratio trapping technique, we demonstrate molecular beam epitaxy of GaAs nanostubs on Si(001) substrates. Nanoholes in a SiO2 mask act as a template for GaAs-on-Si selective-area growth (SAG) of nanostubs 120 nm tall and ≤100 nm in diameter. We investigate the influence of growth parameters including substrate temperature and growth rate on SAG. Optimizing these parameters results in complete selectivity with GaAs growth only on the exposed Si(001). Due to the confined-geometry, strain and defects in the GaAs nanostubs are restricted in lateral dimensions, and surface energy is further minimized. We assess the electrical properties of the selectively grown GaAs nanostubs by fabricating heterogeneous p+-Si/n+-GaAs p-n diodes.

  18. Microwave properties of semi-insulating silicon carbide between 10 and 40 GHz and at cryogenic temperatures

    NASA Astrophysics Data System (ADS)

    Hartnett, John G.; Mouneyrac, David; Krupka, Jerzy; le Floch, Jean-Michel; Tobar, Michael E.; Cros, Dominique


    The complex permittivity of high-purity, semi-insulating, axis-aligned monocrystalline 4H-SiC has been determined over the frequency range 10-40 GHz and at temperatures from 40 up to 295 K using whispering gallery modes and quasi TE0, n , p modes in a dielectric resonator constructed from seven layers of a 375 μm thick wafer. The real part of the permittivity (in the plane of the wafers) was found to be nearly independent of frequency. The dielectric loss tangent of 4H-SiC increases with temperature above 100 K. All results were obtained for the semiconductor in darkness.

  19. Formation of Semi-Insulating Layers on Semiconducting β-Ga2O3 Single Crystals by Thermal Oxidation

    NASA Astrophysics Data System (ADS)

    Oshima, Takayoshi; Kaminaga, Kenichi; Mukai, Akira; Sasaki, Kohei; Masui, Takekazu; Kuramata, Akito; Yamakoshi, Shigenobu; Fujita, Shizuo; Ohtomo, Akira


    Semi-insulating layers (SIL) were formed on the surfaces of nominally undoped β-Ga2O3 (010) single crystals by thermal oxidation. Capacitance-voltage measurement with double Schottky configuration was performed to evaluate the increase in the thickness of the SIL as a function of annealing temperature and time. A SiO2 layer prepared on the surface prevented the extension of the SIL, indicating that oxygen incorporation from air and successive bulk diffusion dominated the carrier compensation process. The activation energy of oxygen diffusion coefficient was estimated to be 4.1 eV.

  20. 808-nm diode-pumped dual-wavelength passively Q-switched Nd:LuLiF4 laser with Bi-doped GaAs

    NASA Astrophysics Data System (ADS)

    Li, S. X.; Li, T.; Li, D. C.; Zhao, S. Z.; Li, G. Q.; Hang, Y.; Zhang, P. X.; Li, X. Y.; Qiao, H.


    Diode-pumped CW and passively Q-switched Nd:LuLiF4 lasers with stable, synchronous dual-wavelength operations near 1047 and 1053 nm were demonstrated for the first time. The maximal CW output power of 821 mW was obtained at an incident pump power of 6.52 W. Employing high quality Bi-doped GaAs as saturable absorber, stable dual-wavelength Q-switched operation was realized. Under 6.52 W incident pump power, the minimal pulse duration of 1.5 ns, the largest single pulse energy of 11.32 μJ, and the highest peak power of 7.25 kW were achieved.

  1. Direct identification of interstitial Mn in heavily p-type doped GaAs and evidence of its high thermal stability

    SciTech Connect

    Pereira, L. M. C.; Wahl, U.; Correia, J. G.; Decoster, S.; Vantomme, A.; Silva, M. R. da; Araujo, J. P.


    We report on the lattice location of Mn in heavily p-type doped GaAs by means of {beta}{sup -} emission channeling from the decay of {sup 56}Mn. The majority of the Mn atoms substitute for Ga and up to 31% occupy the tetrahedral interstitial site with As nearest neighbors. Contrary to the general belief, we find that interstitial Mn is immobile up to 400 deg. C, with an activation energy for diffusion of 1.7-2.3 eV. Such high thermal stability of interstitial Mn has significant implications on the strategies and prospects for achieving room temperature ferromagnetism in Ga{sub 1-x}Mn{sub x}As.

  2. Liquid encapsulated Czochralski growth of low dislocation GaAs

    NASA Technical Reports Server (NTRS)

    Kirkpatrick, C. G.; Chen, R. T.; Holmes, D. E.


    The availability of high-quality, large-diameter GaAs substrates is key to the successful development and production of high-speed GaAs devices and high-efficiency GaAs solar cells. The liquid encapsulated Czochralski (LEC) technique has provided a means for producing large-diameter GaAs. Progress in improving the LEC growth process which has resulted in 3-inch GaAs crystals with exceptionally low dislocation densities and reduced propensity for twinning is reported. Undoped, semi-insulating GaAs ingots were grown in a Melbourn high-pressure LEC system. The effects of seed perfection, seed necking, cone angle, melt stoichiometry, ambient pressure, thickness of the B2O3 encapsulating layer, and diameter control on the dislocation density were investigated. The material was characterized by preferential etching and X-ray topography. It is shown that 3-inch diameter substrates can be produced with dislocation densities as low as 6000 per sq cm through proper selection and control of growth parameters. Also, the incidence of twinning can be reduced significantly by growing from slightly As-rich melts.

  3. Visualization of electrical domains in semi-insulating GaAs:Cr and potential use for variable grating mode operation

    NASA Astrophysics Data System (ADS)

    Rajbenbach, H.; Verdiell, J. M.; Huignard, J. P.


    The results of an experimental optical technique for imaging the electrical domain repartition in semi-insulating GaAs:Cr are reported. The technique is based on the use of the crystal as the active component of a transverse electro-optic two-dimensional light modulator. Under dc applied voltage, the electrical domains are traveling from the cathode to the anode at a velocity that increases with the applied voltage and with the incident illumination (v≂10-100 mm/s). Results for ac applied voltages are also presented. In particular, the observation of stationary and periodically distributed high-field domains in GaAs:Cr is reported for sawtooth applied voltages (1 kV, 50-250 Hz). These high-field domains induce a phase structure whose period is shown to be electrically controllable. This is the first reported demonstration of the possibility of a variable grating mode operation in semiconductors.

  4. Heteroepitaxial growth and multiferroic properties of Mn-doped BiFeO3 films on SrTiO3 buffered III-V semiconductor GaAs

    NASA Astrophysics Data System (ADS)

    Gao, G. Y.; Yang, Z. B.; Huang, W.; Zeng, H. Z.; Wang, Y.; Chan, H. L. W.; Wu, W. B.; Hao, J. H.


    Epitaxial Mn-doped BiFeO3 (MBFO) thin films were grown on GaAs (001) substrate with SrTiO3 (STO) buffer layer by pulsed laser deposition. X-ray diffraction results demonstrate that the films show pure (00l) orientation, and MBFO (100)//STO(100), whereas STO (100)//GaAs (110). Piezoresponse force microscopy images and polarization versus electric field loops indicate that the MBFO films grown on GaAs have an effective ferroelectric switching. The MBFO films exhibit good ferroelectric behavior (2Pr ˜ 92 μC/cm2 and 2EC ˜ 372 kV/cm). Ferromagnetic property with saturated magnetization of 6.5 emu/cm3 and coercive field of about 123 Oe is also found in the heterostructure at room temperature.

  5. Structural properties of pressure-induced structural phase transition of Si-doped GaAs by angular-dispersive X-ray diffraction

    NASA Astrophysics Data System (ADS)

    Lin, Kung-Liang; Lin, Chih-Ming; Lin, Yu-Sheng; Jian, Sheng-Rui; Liao, Yen-Fa; Chuang, Yu-Chun; Wang, Chuan-Sheng; Juang, Jenh-Yih


    Pressure-induced phase transitions in n-type silicon-doped gallium arsenide (GaAs:Si ) at ambient temperature were investigated by using angular-dispersive X-ray diffraction (ADXRD) under high pressure up to around 18.6 (1) GPa, with a 4:1 (in volume ratio) methanol-ethanol mixture as the pressure-transmitting medium. In situ ADXRD measurements revealed that n-type GaAs:Si starts to transform from zinc- blende structure to an orthorhombic structure [GaAs-II phase], space group Pmm2, at 16.4 (1) GPa. In contrast to previous studies of pure GaAs under pressure, our results show no evidence of structural transition to Fmmm or Cmcm phase. The fitting of volume compression data to the third-order Birch-Murnaghan equation of state yielded that the zero-pressure isothermal bulk moduli and the first-pressure derivatives were 75 (3) GPa and 6.4 (9) for the B3 phase, respectively. After decompressing to the ambient pressure, the GaAs:Si appears to revert to the B3 phase completely. By fitting to the empirical relations, the Knoop microhardness numbers are between H PK = 6.21 and H A = 5.85, respectively, which are substantially smaller than the values of 7-7.5 for pure GaAs reported previously. A discontinuous drop in the pressure-dependent lattice parameter, N- N distances, and V/ V 0 was observed at a pressure of 11.5 (1) GPa, which was tentatively attributed to the pressure-induced dislocation activities in the crystal grown by vertical gradient freeze method.

  6. Nonlinear optical studies and CO2 laser-induced melting of Zn-doped GaAs

    NASA Astrophysics Data System (ADS)

    James, R. B.; Mills, B. E.; Christie, W. H.; Eby, R. E.; Darken, L. S., Jr.


    The intensity dependence of the free-hole absorption of CO2 laser radiation in GaAs:Zn crystals has been measured. Experimental results pertaining to nonlinear optical transmission measurements, the topography of the laser-irradiated surfaces, deviations from stoichiometry in the near-surface region, the incorporation of oxygen, and the pulsed laser annealing of ion-implanted GaAs are discussed. The intensity dependence of the nonlinear absorption is found to be closely approximated by an inhomogeneously broadened two-level model; the measured level for the saturation intensity is in good agreement with theoretical calculations. An energy-density 'window' exists for which the resolidified layer is both crystalline and maintains a high degree of surface planarity. Ga-rich regions remain after the solidification of the molten layer. The amount of arsenic loss increases with increasing laser-energy density and number of laser shots.

  7. Semi insulating CdTe:Cl after elimination of inclusions and precipitates by post grown annealing

    NASA Astrophysics Data System (ADS)

    Franc, J.; Belas, E.; Bugár, M.; Hlídek, P.; Grill, R.; Yang, G.; Cavallini, A.; Fraboni, B.; Castaldini, A.; Assali, S.


    We present in this contribution results of two-step annealing, when the CdTe:Cl doped samples are at first annealed under Cd overpressure to remove inclusions and the re-annealed under Te overpressure to restore the high resistivity state. Investigation of samples after Cd rich annealing by infrared microscope has proven, that all inclusions are removed. Also Te nano precipitates were strongly influenced by the annealing process. The resistivity of the samples after Te-rich annealing was restored to values ( ~ 108-109Ωcm). We observed, however, decrease of mobility-lifetime product of electrons from 10-3cm2/Vs to 10-4cm2/Vs. In order to understand the reason of this decrease we performed a study of point defects before and after annealing by thermoelectric effect spectroscopy. It shows a decrease of concentrations of most deep levels after two-step annealing. This behavior is completely different compared to past annealing studies, where concentration of deep levels strongly increased after annealing. The only level with an increased concentration in the current study is the midgap level (E ~ 0.8 eV). At the same time we observed increase of micro-twins in the samples investigated by transmission electron microscopy. The decrease of charge collection efficiency after two-step annealing may be therefore connected with re-arrangement of near midgap levels due to increase of concentrations of structure defects (micro twins, dislocations) that accumulate in their surroundings point defects with energy ~ 0.75 eV.

  8. GaAs thin film epitaxy and x-ray detector development

    NASA Astrophysics Data System (ADS)

    Wynne, Dawnelle I.; Cardozo, B.; Haller, Eugene E.


    We report on the growth of high purity n-GaAs using Liquid Phase Epitaxy and on the fabrication of Schottky barrier diodes for use as x-ray detectors using these layers. Our epilayers are grown form an ultra-pure Ga solvent in a graphite boat in a hydrogen atmosphere. Growth is started at a temperature of approximately 800 degrees C; the temperature is ramped down at 2 degrees C/min. to room temperature. Our best epilayers show a net-residual-donor concentration of approximately 2 X 1012 cm-3, measured by Hall effect. Electron mobilities as high as 150,000 cm2 V-1 s-1 at 77K have been obtained. The residual donors have been analyzed by far IR photothermal ionization spectroscopy and found to be sulfur and silicon. Up to approximately 200 micrometers of epitaxial GaAs have been deposited using several sequential growth runs on semi-insulating and n+-doped substrates. Schottky barrier diodes have been fabricated using this epitaxial material and have been electrically characterized by current-voltage and capacitance-voltage measurements. The Schottky barriers are formed by electron beam evaporation of Pt films. The ohmic contacts are made by electron beam evaporated and alloyed Ni-Ge-Au films on the backside of the substrate. Several of our diodes exhibit dark currents of the order of 0.3-3.3 nA/mm2 at reverse biases depleting approximately 50 micrometers of the epilayer. Electrical characteristics and preliminary performance results of our Schottky diodes using 109Cd and 241Am gamma and x- ray radiation will be discussed.

  9. Photoluminescence fatigue and inhomogeneous line broadening in semi-insulating Tl6SeI4 single crystals

    NASA Astrophysics Data System (ADS)

    Kostina, S. S.; Peters, J. A.; Lin, W.; Chen, P.; Liu, Z.; Wang, P. L.; Kanatzidis, M. G.; Wessels, B. W.


    Photoluminescence (PL) properties of semi-insulating Tl6SeI4 have been investigated. A broad emission band centered at 1.63 ± 0.02 eV was observed in all samples. The PL emission band is excitonic in nature and is tentatively attributed to a bound exciton emission. PL fatigue (a reduction in PL intensity under prolonged laser excitation) was always observed. The amount of PL fatigue depended on excitation power and temperature. PL fatigue kinetics are described by a stretched exponential with nominal lifetimes in the 10–265 s range. The recovery of the PL occurred within a few seconds of light cessation. The magnitude of PL fatigue in different samples correlated with inhomogeneous line broadening of the 1.63 eV emission band, such that broader bands exhibited more fatigue. An additional luminescence band centered at 1.78 eV was observed which increased in intensity under prolonged laser irradiation. The fatigue phenomenon is tentatively attributed to two mechanisms—the formation of photo-induced defects and the formation of quasi-stable particles. Both of these mechanisms introduce additional radiative and non-radiative recombination channels that lead to a decrease in the PL intensity under prolonged laser irradiation. Since inhomogeneous line broadening and PL fatigue are related to the concentration of defects or impurities, the measurement of these two parameters is an effective method to screen sample quality.

  10. Scattering mechanisms in a high-mobility low-density carbon-doped (100) GaAs two-dimensional hole system

    NASA Astrophysics Data System (ADS)

    Watson, J. D.; Mondal, S.; Csáthy, G. A.; Manfra, M. J.; Hwang, E. H.; Das Sarma, S.; Pfeiffer, L. N.; West, K. W.


    We report on a systematic study of the density dependence of mobility in a low-density carbon-doped (100) GaAs two-dimensional hole system (2DHS). At T=50 mK, a mobility of 2.6 × 106 cm2/Vs at a density p=6.2×1010 cm-2 was measured. This is the highest mobility reported for a 2DHS to date. Using a backgated sample geometry, the density dependence of mobility was studied from 2.8 × 1010 cm-2 to 1 × 1011 cm-2. The mobility vs density cannot be fit to a power law dependence of the form μ~pα using a single exponent α. Our data indicate a continuous evolution of the power law with α ranging from ~0.7 at high density and increasing to ~1.7 at the lowest densities measured. Calculations specific to our structure indicate a crossover of the dominant scattering mechanism from uniform background impurity scattering at high density to remote ionized impurity scattering at low densities. This is the first observation of a carrier density-induced transition from background impurity dominated to remote dopant dominated transport in a single sample.

  11. The effects of the magnitude of the modulation field on electroreflectance spectroscopy of undoped-n+ type doped GaAs

    NASA Astrophysics Data System (ADS)

    Wang, D. P.; Huang, K. M.; Shen, T. L.; Huang, K. F.; Huang, T. C.


    The electroreflectance (ER) spectra of an undoped-n+ type doped GaAs has been measured at various amplitudes of modulating fields (δF). Many Franz-Keldysh oscillations were observed above the band gap energy, thus enabling the electric field (F) in the undoped layer to be determined. The F is obtained by applying fast Fourier transformation to the ER spectra. When δF is small, the power spectrum can be clearly resolved into two peaks, which corresponds to heavy- and light-hole transitions. When δF is less than ˜1/8 of the built-in field (Fbi˜77 420 V/cm), the F deduced from the ER is almost independent of δF. However, when larger than this, F is increased with δF. Also, when δF is increased to larger than ˜1/8 of Fbi, a shoulder appears on the right side of the heavy-hole peak of the power spectrum. The separation between the main peak and the shoulder of the heavy-hole peak becomes wider as δF becomes larger.

  12. Reversible electrical properties of LEC GaAs

    NASA Astrophysics Data System (ADS)

    Look, D. C.; Theis, W. M.; Yu, P. W.; Sizelove, J. R.; Ford, W.; Mathur, G.


    Undoped, low-pressure, liquid-encapsulated Czochralski GaAs can be reversibly changed from conducting ( ρ ˜ 1Ω-cm) to semi-insulating ( ρ ˜ 107Ω-cm) by either slow or fast cooling, respectively, after a 5 hr, 950° C soak in an evacuated quartz ampoule. The semi-insulating wafers are very uniform and lead to tight threshold-voltage control in direct-implant MESFET’s. We have studied crystals in both states by temperature-dependent Hall effect, photoluminescence, IR absorption, mass spectroscopy, and DLTS. It is shown that donor and acceptor concentrations are typically more than an order of magnitude greater than the C and Si concentrations, which are both less than 3 × 1014 cm-3. The EL2 concentration remains relatively constant at about 1.0 × 1016 cm-3. Thus, the normal EL2-Si-C compensation model does not apply. The most likely explanation for the reversibility involves a delicate balance between native-defect donors and acceptors in equilibrium at 950° C, but with the donors dominating after a slow cool, and the acceptors after a fast cool. A consistent model includes a dominant donor at Ec 0.13eV, probably VAs AsGa, and a dominant acceptor at Ev + 0.07eV, probably VGa GaAs. In this model, vacancy motion is very important during the slow cool. Such processes must be strongly considered in the growth of bulk, high-purity GaAs.

  13. Optically Detected Electron-Nuclear Double Resonance of As-Antisite Defects in GaAs

    NASA Astrophysics Data System (ADS)

    Hofmann, D. M.; Meyer, B. K.; Lohse, F.; Spaeth, J.-M.


    This Letter reports on the first optically detected electron-nuclear double-resonance (ENDOR) measurements of a paramagnetic semiconductor defect in which ligand hyperfine interactions could be resolved. In semi-insulating GaAs: Cr the ENDOR lines of the first-shell 75As neighbors of the regular tetrahedral AsAs4-antisite defect could be detected and analyzed. The ENDOR investigation reveals that at least one other AsAs4-antisite complex contributes to the same ESR spectrum.

  14. Evolution Of Surface Topography On GaAs(100) And GaAs(111) At Normal And Oblique Incidence Of Ar{sup +}-Ions

    SciTech Connect

    Venugopal, V.; Basu, T.; Garg, S.; Majumder, S.; Sarangi, S. N.; Som, T.; Das, P.; Bhattacharyya, S. R.; Chini, T. K.


    Nanoscale surface structures emerging from medium energy (50-60 keV)Ar{sup +}-ion sputtering of p-type GaAs(100) and semi-insulating GaAs(111) substrates have been investigated. For normally incident 50 keV Ar{sup +}-ions of fluence 1x10{sup 17} ions/cm{sup 2} on GaAs(100) and GaAs(111) features in the form of nanoscale pits/holes without short range ordering are observed with densities 5.2x10{sup 9} /cm{sup 2} and 5.9x10{sup 9} /cm{sup 2}, respectively along with irregularly shaped patches of islands. For GaAs(111) on increasing the influence to 5x10{sup 17} /cm{sup 2} the pit density increases marginally to 6.2x10{sup 9} /cm{sup 2}. For 60 deg. off-normal incidence of 60 keV Ar.{sup +}-ions of fluence 2x10{sup 17} ions/cm{sup 2} on GaAs(100) microscale wavelike surface topography is observed. In all cases well-defined nanodots are absent on the surface.

  15. Carbon-doped high-mobility hole gases on (0 0 1) and (1 1 0) GaAs

    NASA Astrophysics Data System (ADS)

    Gerl, C.; Schmult, S.; Wurstbauer, U.; Tranitz, H.-P.; Mitzkus, C.; Wegscheider, W.


    Since Stormer and Tsang have introduced the first two-dimensional hole gas (2DHG) in the GaAs/AlGaAs heterosystem, the choice of suitable dopants was limited to beryllium and silicon over the last 20 years. Both acceptor atoms have significant disadvantages, i.e. either high-diffusion rates or a limitation to specific growth directions. Utilizing a carbon filament-doping source, we prepared high-quality 2DHGs in the (0 0 1) and the nonpolar (1 1 0) crystal plane with carrier mobilies beyond 10 6 cm 2/Vs in quantum well and single interface structures. Low-temperature magnetoresistance measurements recover a large number of fractional QHE states and show a pronounced beating pattern from which the Rashba induced spin-splitting has been determined. In addition, 2DHGs have been grown on cleaved edges of (1 1 0) and (0 0 1) wafers with transport features in qualitative agreement to our findings on (1 1 0) substrates.

  16. Coherent dynamics of Landau-Levels in modulation doped GaAs quantum wells at high magnetic fields

    NASA Astrophysics Data System (ADS)

    Liu, Cunming; Paul, Jagannath; Reno, John; McGill, Stephen; Hilton, David; Karaiskaj, Denis

    By using two-dimensional Fourier transform spectroscopy, we investigate the dynamics of Landau-Levels formed in modulation doped GaAs/AlGaAs quantum wells of 18 nm thickness at high magnetic fields and low temperature. The measurements show interesting dephasing dynamics and linewidth dependency as a function of the magnetic field. The work at USF and UAB was supported by the National Science Foundation under grant number DMR-1409473. The work at NHMFL, FSU was supported by the National Science Foundation under grant numbers DMR-1157490 and DMR-1229217. This work was performed, in part, at the Center for Integrated Nanotechnologies, a U.S. Department of Energy, Office of Basic Energy Sciences user facility. Sandia National Laboratories is a multi-program laboratory managed and operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin Corporation, for the U.S. Department of Energy's National Nuclear Security Administration under Contract No. DE-AC04-94AL85000.

  17. Electrical and optical properties of carbon-doped GaN grown by MBE on MOCVD GaN templates using a CCl4 dopant source

    SciTech Connect

    Armitage, Rob; Yang, Qing; Feick, Henning; Park, Yeonjoon; Weber, Eicke R.


    Carbon-doped GaN was grown by plasma-assisted molecular-beam epitaxy using carbon tetrachloride vapor as the dopant source. For moderate doping mainly acceptors were formed, yielding semi-insulating GaN. However at higher concentrations p-type conductivity was not observed, and heavily doped films (>5 x 10{sup 20} cm{sup -3}) were actually n-type rather than semi-insulating. Photoluminescence measurements showed two broad luminescence bands centered at 2.2 and 2.9 eV. The intensity of both bands increased with carbon content, but the 2.2 eV band dominated in n-type samples. Intense, narrow ({approx}6 meV) donor-bound exciton peaks were observed in the semi-insulating samples.

  18. Growth and characterization of metamorphic InxGa1-xAs/InAlAs (x >= 0.8) modulation doped heterostructures on GaAs using a linearly graded In(AlGa)as buffer layer

    NASA Astrophysics Data System (ADS)

    Wang, S. M.; Karlsson, C.; Rorsman, N.; Bergh, M.; Olsson, E.; Andersson, T. G.


    Metamorphic InxGa1-xAs/InAlAs (x >= 0.8) modulation doped heterostructures have been grown on GaAs using a linearly graded In(AlGa)As buffer layer, and their structural and electric properties have been investigated. Surface morphology was found to depend on growth temperature and graded buffer thickness. Low growth temperature resulted in a relatively smooth surface with a minimum root-mean-square roughness value of 4-7 nm. The In(AlGa)As graded buffer effectively prevented dislocations from threading into the top layers. The epilayer grown on the graded buffer was tilted and not fully relaxed. High electron mobility and sheet density were achieved. The highest mobility value was 13740 cm2/Vs with a carrier density of 1.9 · 1012 cm-2 at 300 K. These values are comparable with InP-based InGaAs/InAlAs modulation doped heterostructures.

  19. An AFM-based surface oxidation process for heavily carbon-doped p-type GaAs with a hole concentration of 1.5×1021 cm-3

    NASA Astrophysics Data System (ADS)

    Shirakashi, J.-I.; Matsumoto, K.; Konagai, M.

    Under appropriate bias conditions in ambient humidity, AFM can be used to selectively oxidize the surface of electronic materials such as metals and semiconductors. Therefore, an AFM-based surface modification technique would be a powerful tool for fabricating nanometer-sized metal (M)/insulator (I) or semiconductor (S)/insulator (I) junction structures. Heavily carbon-doped p-type GaAs with a hole concentration of 1.5×1021 cm-3 is also of great interest for application to novel device structures, because the carrier concentration is comparable to that of normal metals. Selective surface oxidation of carbon-doped p-type GaAs was achieved using a negatively biased conductive tip. The oxidation shown here was carried out under 20-25% ambient humidity. By changing the applied bias voltage and the scanning speed of the cantilever, the size of the modified structure wires was precisely controlled, with a feature size of 10 nm. These results suggest that GaAs-based devices with ultra-small SIS junction systems could be realized using the AFM-based surface oxidation process.

  20. Wafer-fused orientation-patterned GaAs

    NASA Astrophysics Data System (ADS)

    Li, Jin; Fenner, David B.; Termkoa, Krongtip; Allen, Mark G.; Moulton, Peter F.; Lynch, Candace; Bliss, David F.; Goodhue, William D.


    The fabrication of thick orientation-patterned GaAs (OP-GaAs) films is reported using a two-step process where an OP-GaAs template with the desired crystal domain pattern was prepared by wafer fusion bonding and then a thick film was grown over the template by low pressure hydride vapor phase epitaxy (HVPE). The OP template was fabricated using molecular beam epitaxy (MBE) followed by thermocompression wafer fusion, substrate removal, and lithographic patterning. On-axis (100) GaAs substrates were utilized for fabricating the template. An approximately 350 μm thick OP-GaAs film was grown on the template at an average rate of ~70 μm/hr by HVPE. The antiphase domain boundaries were observed to propagate vertically and with no defects visible by Nomarski microscopy in stain-etched cross sections. The optical loss at ~2 μm wavelength over an 8 mm long OP-GaAs grating was measured to be no more than that of the semi-insulating GaAs substrate. This template fabrication process can provide more flexibility in arranging the orientation of the crystal domains compared to the Ge growth process and is scalable to quasi-phase-matching (QPM) devices operating from the IR to terahertz frequencies utilizing existing industrial foundries.

  1. Stoichiometry-controlled compensation in liquid encapsulated Czochralski GaAs

    NASA Technical Reports Server (NTRS)

    Holmes, D. E.; Chen, R. T.; Elliott, K. R.; Kirkpatrick, C. G.


    It is shown that the electrical compensation of undoped GaAs grown by the liquid encapsulated Czochralski technique is controlled by the melt stoichiometry. The concentration of the deep donor EL2 in the crystal depends on the As concentration in the melt, increasing from about 5 x 10 to the 15th per cu cm to 1.7 x 10 to the 16th per cu cm as the As atom fraction increases from 0.48 to 0.51. Furthermore, it is shown that the free-carrier concentration of semi-insulating GaAs is determined by the relative concentrations of EL2 and carbon acceptors. As a result, semi-insulating material can be obtained only above a critical As concentration (0.475-atom fraction in the material here) where the concentration of EL2 is sufficient to compensate residual acceptors. Below the critical As concentration the material is p type due to excess acceptors.

  2. Study of microdefects and their distribution in dislocation-free Si-doped HB GaAs by X-ray diffuse scattering on triple-crystal diffractometer

    NASA Astrophysics Data System (ADS)

    Charniy, L. A.; Morozov, A. N.; Bublik, V. T.; Scherbachev, K. D.; Stepantsova, I. V.; Kaganer, V. M.


    Microdefects in dislocation-free Si-doped (n = (1-3) × 10 18cm-3) HB GaAs crystals were studied by X-ray diffuse scattering measured with the help of a triple-crystal diffractometer. The intensity of the diffuse scattering as well as the isointensity contours around different reciprocal lattice points were analysed. A comparison of the measured isointensity contours with the theoretically calculated ones showed that the microdefects detected are interstitial dislocation loops with the Burgers vectors b = {1}/{2}<110 #3862;; lying in the planes #38;{110} and {111}. The mean radius of the dislocation loops R0 was determined using the wave vector q0 alpha; R-10 corresponding to the transmition point where the Huang diffuse scattering I( q) alpha q-2 ( q < q0) changed to the asymptotic scattering I( q) alpha q-4 ( q #62 q0). The analysis of a D-shaped cross-sectional (111) wafer cut from the end part of the HB ingot showed that R0 changed smoothly along the [ overline211] symmetry axis of the wafer. The highly inhomogeneous "new-moon"-like distribution of the non-dislocational etch-pits was also obtained. The maximal loop radius obtained at the edges of the wafer, R 0 = 1 μm, corresponds to the wafer area enriched with etch-pits and the minimal one, R 0 = 0.3 μm, corresponds to the bound of the new-moon-like area denuded from etch-pits. Microdefects of a new type were detected in the denuded area. These microdefects consist of nuclei, 0.1 μm in radius, and an extended atmosphere of interstitials. The minimal microdefect radius in the centre of the wafer corresponds to the maximum local value of the lattice parameter a = 5.655380 Å, and the minimum local value a = 5.65372 Å was obtained at the wafer edges enriched with microdefect-related etch-pits. Absolute X-ray diffuse intensity measurements were used for microdefect concentration determination. Normalization of I( q) was based on the comparison of the Huang intensity with the thermal diffuse scattering

  3. Semi-insulating GaN:C epilayers grown by metalorganic vapor phase epitaxy using propane as a carbon source

    NASA Astrophysics Data System (ADS)

    Lundin, W. V.; Zavarin, E. E.; Brunkov, P. N.; Yagovkina, M. A.; Sakharov, A. V.; Sinitsyn, M. A.; Ber, B. Ya.; Kazantsev, D. Yu.; Tsatsulnikov, A. F.


    The influence of propane present in a reactor at various stages of GaN growth by metalorganic vapor phase epitaxy (MOVPE) on sapphire substrates on the character of epitaxial process and the properties of epilayers has been studied. Doped GaN epilayers with carbon concentration 5 × 1018 cm-3 characterized by high crystalline perfection, an atomically smooth surface, and electric breakdown voltage above 500 V at a doped layer thickness of 4 μm have been obtained.

  4. Highly doped p-ZnTe films and quantum well structures grown by nonequilibrium pulsed laser ablation

    SciTech Connect

    Lowndes, D.H.; Rouleau, C.M.; Budai, J.D.; Geohegan, D.B.; McCamy, J.W.


    Highly p-doped ZnTe films have been grown on semi-insulating GaAs (001) and unintentionally doped (p-type) GaSb (001) substrates by pulsed KrF (248 nm) excimer laser ablation of a ZnTe target through an N{sub 2} ambient, without the use of any assisting (DC or AC) plasma source. Free hole concentrations in the mid-10{sup 19} cm{sup {minus}3} to > 10{sup 20} cm{sup {minus}3} range have been obtained. This appears to be the first time that any wide band gap (E{sub g} {ge} 2 eV) II-VI compound (or other) semiconductor has been impurity-doped from the gas phase by pulsed-laser ablation (PLA). The maximum carrier concentrations also may be the highest obtained for ZnTe by any method thus far. Because pulsed laser deposition is inherently digital, attractive deposition rates can be combined with precise control of layer thickness in epitaxial multilayered structures. Typical deposition conditions are < 0.5 {angstrom} per laser pulse, with crystalline quality governed by tradeoffs between substrate temperature, pulse repetition rate, and the focused pulsed laser energy density. PLA`s capability for growth of very thin epitaxial layers is being exploited and studied through growth of doped heteroepitaxial quantum well structures in the nearly lattice-matched ZnTe/CdSe//GaSb(substrate) system. Results obtained from growth and characterization of heterostructures in this system will be presented.

  5. Analysis of high field effects on the steady-state current-voltage response of semi-insulating 4H-SiC for photoconductive switch applications

    SciTech Connect

    Tiskumara, R.; Joshi, R. P. Mauch, D.; Dickens, J. C.; Neuber, A. A.


    A model-based analysis of the steady-state, current-voltage response of semi-insulating 4H-SiC is carried out to probe the internal mechanisms, focusing on electric field driven effects. Relevant physical processes, such as multiple defects, repulsive potential barriers to electron trapping, band-to-trap impact ionization, and field-dependent detrapping, are comprehensively included. Results of our model match the available experimental data fairly well over orders of magnitude variation in the current density. A number of important parameters are also extracted in the process through comparisons with available data. Finally, based on our analysis, the possible presence of holes in the samples can be discounted up to applied fields as high as ∼275 kV/cm.

  6. Measured Attenuation of Coplanar Waveguide on 6H, p-type SiC and High Purity Semi-Insulating 4H SiC through 800 K

    NASA Technical Reports Server (NTRS)

    Ponchak, George E.; Schwartz, Zachary D.; Alterovitz, Samuel A.; Downey, Alan N.


    Wireless sensors for high temperature applications such as oil drilling and mining, automobiles, and jet engine performance monitoring require circuits built on wide bandgap semiconductors. In this paper, the characteristics of microwave transmission lines on 4H-High Purity Semi-Insulating SiC and 6H, p-type SiC is presented as a function of temperature and frequency. It is shown that the attenuation of 6H, p-type substrates is too high for microwave circuits, large leakage current will flow through the substrate, and that unusual attenuation characteristics are due to trapping in the SiC. The 4H-HPSI SiC is shown to have low attenuation and leakage currents over the entire temperature range.

  7. High temperature annealing effects on deep-level defects in a high purity semi-insulating 4H-SiC substrate

    SciTech Connect

    Iwamoto, Naoya Azarov, Alexander; Svensson, Bengt G.; Ohshima, Takeshi; Moe, Anne Marie M.


    Effects of high-temperature annealing on deep-level defects in a high-purity semi-insulating 4H silicon carbide substrate have been studied by employing current-voltage, capacitance-voltage, junction spectroscopy, and chemical impurity analysis measurements. Secondary ion mass spectrometry data reveal that the substrate contains boron with concentration in the mid 10{sup 15 }cm{sup −3} range, while other impurities including nitrogen, aluminum, titanium, vanadium and chromium are below their detection limits (typically ∼10{sup 14 }cm{sup −3}). Schottky barrier diodes fabricated on substrates annealed at 1400–1700 °C exhibit metal/p-type semiconductor behavior with a current rectification of up to 8 orders of magnitude at bias voltages of ±3 V. With increasing annealing temperature, the series resistance of the Schottky barrier diodes decreases, and the net acceptor concentration in the substrates increases approaching the chemical boron content. Admittance spectroscopy results unveil the presence of shallow boron acceptors and deep-level defects with levels in lower half of the bandgap. After the 1400 °C annealing, the boron acceptor still remains strongly compensated at room temperature by deep donor-like levels located close to mid-gap. However, the latter decrease in concentration with increasing annealing temperature and after 1700 °C, the boron acceptor is essentially uncompensated. Hence, the deep donors are decisive for the semi-insulating properties of the substrates, and their thermal evolution limits the thermal budget for device processing. The origin of the deep donors is not well-established, but substantial evidence supporting an assignment to carbon vacancies is presented.

  8. High temperature annealing effects on deep-level defects in a high purity semi-insulating 4H-SiC substrate

    NASA Astrophysics Data System (ADS)

    Iwamoto, Naoya; Azarov, Alexander; Ohshima, Takeshi; Moe, Anne Marie M.; Svensson, Bengt G.


    Effects of high-temperature annealing on deep-level defects in a high-purity semi-insulating 4H silicon carbide substrate have been studied by employing current-voltage, capacitance-voltage, junction spectroscopy, and chemical impurity analysis measurements. Secondary ion mass spectrometry data reveal that the substrate contains boron with concentration in the mid 1015 cm-3 range, while other impurities including nitrogen, aluminum, titanium, vanadium and chromium are below their detection limits (typically ˜1014 cm-3). Schottky barrier diodes fabricated on substrates annealed at 1400-1700 °C exhibit metal/p-type semiconductor behavior with a current rectification of up to 8 orders of magnitude at bias voltages of ±3 V. With increasing annealing temperature, the series resistance of the Schottky barrier diodes decreases, and the net acceptor concentration in the substrates increases approaching the chemical boron content. Admittance spectroscopy results unveil the presence of shallow boron acceptors and deep-level defects with levels in lower half of the bandgap. After the 1400 °C annealing, the boron acceptor still remains strongly compensated at room temperature by deep donor-like levels located close to mid-gap. However, the latter decrease in concentration with increasing annealing temperature and after 1700 °C, the boron acceptor is essentially uncompensated. Hence, the deep donors are decisive for the semi-insulating properties of the substrates, and their thermal evolution limits the thermal budget for device processing. The origin of the deep donors is not well-established, but substantial evidence supporting an assignment to carbon vacancies is presented.

  9. LEC GaAs for integrated circuit applications

    NASA Technical Reports Server (NTRS)

    Kirkpatrick, C. G.; Chen, R. T.; Homes, D. E.; Asbeck, P. M.; Elliott, K. R.; Fairman, R. D.; Oliver, J. D.


    Recent developments in liquid encapsulated Czochralski techniques for the growth of semiinsulating GaAs for integrated circuit applications have resulted in significant improvements in the quality and quantity of GaAs material suitable for device processing. The emergence of high performance GaAs integrated circuit technologies has accelerated the demand for high quality, large diameter semiinsulating GaAs substrates. The new device technologies, including digital integrated circuits, monolithic microwave integrated circuits and charge coupled devices have largely adopted direct ion implantation for the formation of doped layers. Ion implantation lends itself to good uniformity and reproducibility, high yield and low cost; however, this technique also places stringent demands on the quality of the semiinsulating GaAs substrates. Although significant progress was made in developing a viable planar ion implantation technology, the variability and poor quality of GaAs substrates have hindered progress in process development.

  10. The electrical properties of 60 keV zinc ions implanted into semi-insulating gallium arsenide

    NASA Technical Reports Server (NTRS)

    Littlejohn, M. A.; Anikara, R.


    The electrical behavior of zinc ions implanted into chromium-doped semiinsulating gallium arsenide was investigated by measurements of the sheet resistivity and Hall effect. Room temperature implantations were performed using fluence values from 10 to the 12th to 10 to the 15th power/sq cm at 60 keV. The samples were annealed for 30 minutes in a nitrogen atmosphere up to 800 C in steps of 200 C and the effect of this annealing on the Hall effect and sheet resistivity was studied at room temperature using the Van der Pauw technique. The temperature dependence of sheet resistivity and mobility was measured from liquid nitrogen temperature to room temperature. Finally, a measurement of the implanted profile was obtained using a layer removal technique combined with the Hall effect and sheet resistivity measurements.

  11. Steady State Properties of Lock-On Current Filaments in GaAs

    NASA Astrophysics Data System (ADS)

    Kambour, K.; Kang, Samsoo; Myles, Charles W.; Hjalmarson, Harold P.


    Collective impact ionization has been used by Hjalmarson et al.(H. Hjalmarson, F. Zutavern, G. Loubriel, A. Baca, and D. Wake, Sandia Report SAND93-3972(1996).) to explain the lock-on effect, observed in optically activated, semi-insulating GaAs switches. We have used this theory to study some of the steady state properties of the lock-on current filaments which accompany this effect. In steady state, the energy gained from the electric field is exactly compensated for by the the energy lost due to the phonon cooling of the hot carriers. In the simplest approximation, the carrier distribution approaches a quasi-equilibrium Maxwell-Boltzmann distribution. In this presentation we report preliminary results on the validity of this quasi-equilibrium approximation. We find that this approximation leads to a filament carrier density which is much lower than the high density needed to achieve a quasi-equilibrium distribution. Further work is in progress.

  12. Current Sharing Among Multiple Lock-On Filaments in GaAs

    NASA Astrophysics Data System (ADS)

    Hjalmarson, H. P.; Loubriel, G. M.; Zutavern, F. J.


    Optically-triggered, high-power photoconductive semiconductor switches (PCSS's) using semi-insulating GaAs are under development at Sandia. These switches carry current in high carrier-density filaments. A major problem is the increased electrode damage in high power applications. One method we use to increase switch longevity is to trigger multiple filaments which share the current. For this talk, a hydrodynamic implementation of the collective impact ionization theory is used to evaluate and refine this method. To be specific, the current-voltage characteristic for two filaments is compared with that for a single filament. An important issue is the interaction of the two filaments as a function of their distance separation.

  13. Effect of Split Gate Size on the Electrostatic Potential and 0.7 Anomaly within Quantum Wires on a Modulation-Doped GaAs /AlGaAs Heterostructure

    NASA Astrophysics Data System (ADS)

    Smith, L. W.; Al-Taie, H.; Lesage, A. A. J.; Thomas, K. J.; Sfigakis, F.; See, P.; Griffiths, J. P.; Farrer, I.; Jones, G. A. C.; Ritchie, D. A.; Kelly, M. J.; Smith, C. G.


    We study 95 split gates of different size on a single chip using a multiplexing technique. Each split gate defines a one-dimensional channel on a modulation-doped GaAs /AlGaAs heterostructure, through which the conductance is quantized. The yield of devices showing good quantization decreases rapidly as the length of the split gates increases. However, for the subset of devices showing good quantization, there is no correlation between the electrostatic length of the one-dimensional channel (estimated using a saddle-point model) and the gate length. The variation in electrostatic length and the one-dimensional subband spacing for devices of the same gate length exceeds the variation in the average values between devices of different lengths. There is a clear correlation between the curvature of the potential barrier in the transport direction and the strength of the "0.7 anomaly": the conductance value of the 0.7 anomaly reduces as the barrier curvature becomes shallower. These results highlight the key role of the electrostatic environment in one-dimensional systems. Even in devices with clean conductance plateaus, random fluctuations in the background potential are crucial in determining the potential landscape in the active device area such that nominally identical gate structures have different characteristics.

  14. Photoluminescence properties of modulation-doped In{sub x}Al{sub 1–x}As/In{sub y}Ga{sub 1–y}As/In{sub x}Al{sub 1–x}As structures with strained inas and gaas nanoinserts in the quantum well

    SciTech Connect

    Galiev, G. B.; Vasil’evskii, I. S.; Klimov, E. A.; Klochkov, A. N.; Lavruhin, D. V.; Pushkarev, S. S.; Maltsev, P. P.


    The photoluminescence spectra of modulation-doped InAlAs/InGaAs/InAlAs heterostructures with quantum wells containing thin strained InAs and GaAs inserts are investigated. It is established that the insertion of pair InAs layers and/ or a GaAs transition barriers with a thickness of 1 nm into a quantum well leads to a change in the form and energy position of the photoluminescence spectra as compared with a uniform In{sub 0.53}Ga{sub 0.47}As quantum well. Simulation of the band structure shows that this change is caused by a variation in the energy and wave functions of holes. It is demonstrated that the use of InAs inserts leads to the localization of heavy holes near the InAs layers and reduces the energy of optical transitions, while the use of GaAs transition barriers can lead to inversion of the positions of the light- and heavy-hole subbands in the quantum well. A technique for separately controlling the light- and heavy-hole states by varying the thickness and position of the GaAs and InAs inserts in the quantum well is suggested.

  15. Identification of As-vacancy complexes in Zn-diffused GaAs

    SciTech Connect

    Elsayed, M.; Krause-Rehberg, R.; Korff, B.; Richter, S.; Leipner, H. S.


    We have used positron annihilation spectroscopy to study the introduction of point defects in Zn-diffused semi-insulating GaAs. The diffusion was performed by annealing the samples for 2 h at 950 Degree-Sign C. The samples were etched in steps of 7 {mu}m. Both Doppler broadening using slow positron beam and lifetime spectroscopy studies were performed after each etching step. Both techniques showed the existence of vacancy-type defects in a layer of about 45 {mu}m. Secondary ion mass spectroscopy measurements illustrated the presence of Zn at high level in the sample almost up to the same depth. Vacancy-like defects as well as shallow positron traps were observed by lifetime measurements. We distinguish two kinds of defects: As vacancy belongs to defect complex, bound to most likely one Zn atom incorporated on Ga sublattice, and negative-ion-type positron traps. Zn acceptors explained the observation of shallow traps. The effect of Zn was evidenced by probing GaAs samples annealed under similar conditions but without Zn treatment. A defect-free bulk lifetime value is detected in this sample. Moreover, our positron annihilation spectroscopy measurements demonstrate that Zn diffusion in GaAs system is governed by kick-out mechanism.

  16. X-ray imaging using a 320 x 240 hybrid GaAs pixel detector

    SciTech Connect

    Irsigler, R.; Andersson, J.; Alverbro, J.


    The authors present room temperature measurements on 200 {micro}m thick GaAs pixel detectors, which were hybridized to silicon readout circuits. The whole detector array contains 320 x 240 square shaped pixel with a pitch of 38 {micro}m and is based on semi-insulating liquid-encapsulated Czochralski (LEC) GaAs material. After fabricating and dicing, the detector chips were indium bump flip chip bonded to CMOS readout circuits based on charge integration and finally evaluated. This readout chip was originally designed for the readout of flip chip bonded infrared detectors, but appears to be suitable for X-ray applications as well. A bias voltage between 50 V and 100 V was sufficient to operate the detector at room temperature. The detector array did respond to x-ray radiation by an increase in current due to production of electron hole pairs by the ionization processes. Images of various objects and slit patterns were acquired by using a standard X-ray source for dental imaging. The new X-ray hybrid detector was analyzed with respect to its imaging properties. Due to the high absorption coefficient for X-rays in GaAs and the small pixel size, the sensor shows a high modulation transfer function up to the Nyquist frequency.

  17. Origin and reduction of impurities at GaAs epitaxial layer-substrate interfaces

    NASA Astrophysics Data System (ADS)

    Kanber, H.; Yang, H. T.; Zielinski, T.; Whelan, J. M.


    Surface cleaning techniques used for semi-insulating GaAs substrates prior to epitaxial growth can have an important and sometimes detrimental effect on the quality and characteristics of epitaxial layers that are grown on them. We observe that a HF rinse followed by a 5:1:1 H 2SO 4:H 2O 2:H 2O etch and H 2O rinse drastically reduced the maximum concentrations and total amount of both SIMS detected S and Si for MOCVD grown GaAs undoped epitaxial layers. Subsequent final HCl and H 2O reduced the S interfacial residues to the SIMS detection limit. Total amounts of residual Si are estimated to be equivalent to 10 -2 to 10 -3 monolayers. Residual S is less. Alternately the S residue can be comparable reduced by a HF rinse followed by a NH 4OH:H 2O 2:H 2O etch and H 2O rinse. Hot aqueous HCl removes S but not Si residues. The Si residue is not electrically active and most likely exists as islands of SiO 2. The relative significance of the impurity residues is most pronounced for halide VPE, smaller for MBE and least for MOCVD grown GaAs epitaxial layers.

  18. ZnSe Window Layers for GaAs and GaInP2 Solar Cells

    NASA Technical Reports Server (NTRS)

    Olsen, Larry C.


    This report concerns studies of the use of ZnSe as a window layer for GaAs solar cells. Well-oriented crystalline ZnSe films on (100) single crystal GaAs substrates were grown by MOCVD. In particular, ZnSe films were grown by reacting a zinc adduct with hydrogen selenide at temperatures in the range of 200 C to 400 C. X-ray diffraction studies and images obtained with an atomic force microscope determined that the films were highly oriented but were polycrystalline. Particular emphasis was placed on the use of a substrate temperature of 350 C. Using iodine as a dopant, n-type ZnSe films with resistivities in the range of .01 to .05 ohm-cm were grown on semi-insulating GaAs. Thus procedures have been developed for investigating the utility of n-type ZnSe window layers on n/p GaAs structures. Studies of recombination at n-ZnSe/n-GaAs interfaces in n-ZnSe/n-GaAs/p-GaAs cell structures are planned for future work.

  19. Isoelectronic co-doping


    Mascarenhas, Angelo


    Isoelectronic co-doping of semiconductor compounds and alloys with deep acceptors and deep donors is used to decrease bandgap, to increase concentration of the dopant constituents in the resulting alloys, and to increase carrier mobilities lifetimes. Group III-V compounds and alloys, such as GaAs and GaP, are isoelectronically co-doped with, for example, N and Bi, to customize solar cells, thermal voltaic cells, light emitting diodes, photodetectors, and lasers on GaP, InP, GaAs, Ge, and Si substrates. Isoelectronically co-doped Group II-VI compounds and alloys are also included.

  20. Absorption coefficient and relative refractive index change for a double δ-doped GaAs MIGFET-like structure: Electric and magnetic field effects

    NASA Astrophysics Data System (ADS)

    Martínez-Orozco, J. C.; Rodríguez-Magdaleno, K. A.; Suárez-López, J. R.; Duque, C. A.; Restrepo, R. L.


    In this work we present theoretical results for the electronic structure as well as for the absorption coefficient and relative refractive index change for an asymmetric double δ-doped like confining potential in the active region of a Multiple Independent Gate Field Effect Transistor (MIGFET) system. We model the potential profile as a double δ-doped like potential profile between two Schottky (parabolic) potential barriers that are just the main characteristics of the MIGFET configuration. We investigate the effect of external electromagnetic fields in this kind of quantum structures, in particular we applied a homogeneous constant electric field in the growth direction z as well as a homogeneous constant magnetic field in the x-direction. In general we conclude that by applying electromagnetic fields we can modulate the resonant peaks of the absorption coefficient as well as their energy position. Also with such probes it is possible to control the nodes and amplitude of the relative refractive index changes related to resonant intersubband optical transitions.

  1. Fe-doped InN layers grown by molecular beam epitaxy

    SciTech Connect

    Wang Xinqiang; Liu Shitao; Ma Dingyu; Zheng Xiantong; Chen Guang; Xu Fujun; Tang Ning; Shen Bo; Zhang Peng; Cao Xingzhong; Wang Baoyi; Huang Sen; Chen, Kevin J.; Zhou Shengqiang; Yoshikawa, Akihiko


    Iron(Fe)-doped InN (InN:Fe) layers have been grown by molecular beam epitaxy. It is found that Fe-doping leads to drastic increase of residual electron concentration, which is different from the semi-insulating property of Fe-doped GaN. However, this heavy n-type doping cannot be fully explained by doped Fe-concentration ([Fe]). Further analysis shows that more unintentionally doped impurities such as hydrogen and oxygen are incorporated with increasing [Fe] and the surface is degraded with high density pits, which probably are the main reasons for electron generation and mobility reduction. Photoluminescence of InN is gradually quenched by Fe-doping. This work shows that Fe-doping is one of good choices to control electron density in InN.

  2. Polarization doping of graphene on silicon carbide

    NASA Astrophysics Data System (ADS)

    Mammadov, Samir; Ristein, Jürgen; Koch, Roland J.; Ostler, Markus; Raidel, Christian; Wanke, Martina; Vasiliauskas, Remigijus; Yakimova, Rositza; Seyller, Thomas


    The doping of quasi-freestanding graphene (QFG) on H-terminated, Si-face 6H-, 4H-, and 3C-SiC is studied by angle-resolved photoelectron spectroscopy close to the Dirac point. Using semi-insulating as well as n-type doped substrates we shed light on the contributions to the charge carrier density in QFG caused by (i) the spontaneous polarization of the substrate, and (ii) the band alignment between the substrate and the graphene layer. In this way we provide quantitative support for the previously suggested model of polarization doping of graphene on SiC (Ristein et al 2012 Phys. Rev. Lett. 108 246104).

  3. Continuous visible-light emission at room temperature in Mn-doped GaAs and Si light-emitting diodes (Presentation Recording)

    NASA Astrophysics Data System (ADS)

    Tanaka, Masaaki; Hai, Pham Nam; Anh, Le Duc


    We demonstrate visible-light electroluminescence due to d-d transitions in GaAs:Mn based light emitting diodes (LEDs) [1][2]. We prepared p+n junctions with a p+GaAs:Mn layer. At a reverse bias voltage (-3 to -6V), holes are injected from the n-type layer to the depletion layer and accelerated by the intense electric field, and excite the d electrons of Mn in the p+GaAs:Mn layer by impact excitations. We observe visible-light emission E1 = 1.89eV and E2 = 2.16eV, which are exactly the same as the 4T1 -> 6A1 and 4A2 -> 4 T1 transition energy of Mn. Furthermore, by utilizing optical transitions between the p-d hybridized orbitals of Mn atoms doped in Si, we demonstrate Si-based LEDs that continuously emit reddish-yellow visible light at room temperature. The Mn p-d hybrid states are excited by hot holes that are accelerated in the depletion layers of reverse biased Si pn junctions. Above a threshold reverse bias voltage of about -4V, our LEDs show strong visible light emission with two peaks at E1 = 1.75eV and E2 = 2.30eV, corresponding to optical transitions from the t-a (spin-down anti-bonding) states to the e- (spin-down non-bonding) states, and from the e- to the t+a (spin-up anti-bonding) states. The internal quantum efficiency of the E1 and E2 transitions is 3-4 orders of magnitude higher than that of the indirect band-gap transition [3]. [1] P. N. Hai, et al., APL 104, 122409 (2014). [2] P. N. Hai, et al., JAP 116, 113905 (2014). [3] P. N. Hai, et al., submitted.

  4. Performance of monolithic integrated series-connected GaAs solar cells under concentrated light

    NASA Astrophysics Data System (ADS)

    Seno, Minato; Watanabe, Kentaroh; Sugiyama, Masakazu; Nakano, Yoshiaki


    The concentrator photovoltaic (CPV) system provides excellent cost performance and conversion efficiency by increasing the concentration ratio. The problem is that concentration ratio is limited by short-circuit current density (Jsc) due to cell resistance loss. In order to achieve much larger concentration ratio, the monolithically integrated series-connected GaAs photovoltaic (PV) cells were fabricated. By dividing a cell into sub-cells on a chip and connecting them in series, the cell provides smaller short-circuit current (Isc) and larger open-circuit voltage (Voc). This approach can reduce joule energy loss inside a cell without decreasing electrical power output and allow much larger concentration ratio. In our design, 10 series-connected sub-cells, with bypass diodes in parallel with each sub-cell, were integrated monolithically on semi-insulating GaAs. When some sub-cells in the array were shaded, the bypass diodes prevented the shaded sub-cells from breakdown and reduced fluctuation of power output. The detection area of a unit cell was 1.73 mm2 and an entire detection area occupied over 68% of the whole chip area. The arrayed 10 cells exhibited Voc of 9.0 V under illumination (AM 1.5G). The series-connected cell achieved maximum efficiency at higher concentration ratio than non-series-connected cell.

  5. GaAs laser diode pumped Nd:YAG laser

    NASA Technical Reports Server (NTRS)

    Conant, L. C.; Reno, C. W.


    A 1.5-mm by 3-cm neodymium-ion doped YAG laser rod has been side pumped using a GaAs laser diode array tuned to the 8680-A absorption line, achieving a multimode average output power of 120 mW for a total input power of 20 W to the final-stage laser diode drivers. The pumped arrangement was designed to take advantage of the high brightness of a conventional GaAs array as a linear source by introducing the pump light through a slit into a close-wrapped gold coated pump cavity. This cavity forms an integrating chamber for the pump light.

  6. Magnetron Sputtered Gold Contacts on N-gaas

    NASA Technical Reports Server (NTRS)

    Buonaquisti, A. D.; Matson, R. J.; Russell, P. E.; Holloway, P. H.


    Direct current planar magnetron sputtering was used to deposit gold Schottky barrier electrical contacts on n-type GaAs of varying doping densities. The electrical character of the contact was determined from current voltage and electron beam induced voltage data. Without reducing the surface concentration of carbon and oxide, the contacts were found to be rectifying. There is evidence that energetic neutral particles reflected from the magnetron target strike the GaAs and cause interfacial damage similar to that observed for ion sputtering. Particle irradiation of the surface during contact deposition is discussed.

  7. Interface demarcation in GaAs by current pulsing

    NASA Technical Reports Server (NTRS)

    Matthiesen, D. H.; Kafalas, J. A.; Duchene, G. A.; Bellows, A. H.


    GTE Laboratories is currently conducting a program to investigate the effect of convection in the melt on the properties of bulk grown gallium arsenide (GaAs). In addition to extensive ground based experimentation, a Get Away Special growth system has been developed to grow two GaAs crystals aboard the Space Shuttle, each with a one inch diameter. In order to perform a complete segregation analysis of the crystals grown in space, it is necessary to measure the interface shape and growth rate as well as the spatial distribution of the selenium dopant. The techniques for interface demarcation in selenium doped GaAs by current pulsing have been developed at GTE Laboratories and successful interface demarcation has been achieved for current pulses ranging from 20 to 90 amps, in both single crystal and polycrystalline regions.

  8. Cubic GaS: A Surface Passivator For GaAs

    NASA Technical Reports Server (NTRS)

    Hepp, Aloysius F.; Barron, Andrew R.; Power, Michael B.; Jenkins, Phillip P.; Macinnes, Andrew N.


    Thin films of cubic form of gallium sulfide (GaS) formed on surfaces of gallium arsenide (GaAs) substrates via metal/organic chemical vapor deposition (MOCVD). Deposited cubic GaS, crystalline lattice matched to substrate GaAs, neutralizes electrically active defects on surfaces of both n-doped and p-doped GaAs. Enabling important GaAs-based semiconducting materials to serve as substrates for metal/insulator/semiconductor (MIS) capacitors. Cubic GaS enables fabrication of ZnSe-based blue lasers and light-emitting diodes. Because GaS is optically transparent, deposited to form window layers for such optoelectronic devices as light-emitting diodes, solar optical cells, and semiconductor lasers. Its transparency makes it useful as interconnection material in optoelectronic integrated circuits. Also useful in peeled-film technology because selectively etched from GaAs.

  9. Effect of growth temperature and GaAs substrate misorientation on the morphology of InAsBi nanoislands grown by metalorganic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Boussaha, R.; Fitouri, H.; Rebey, A.; Jani, B. El


    The structural properties of InAsBi nanoislands grown on semi insulating GaAs by atmospheric pressure metalorganic vapor phase epitaxy, using trimethyl indium, trimethyl bismuth, and arsine as precursor sources have been studied. The influence of growth temperature and substrate misorientation on the surface morphologies of these nanostructures have been controlled by means of atomic force microscopy. The results show InAsBi islands formation on the studied samples. The density, shape, size and the size dispersion of these islands vary greatly with growth temperature. So, below 400 °C island density increases with increasing growth temperature and accompanied by appearance of ridges. Increasing temperature over 400 °C induces a decrease in the island density and enlargement of sizes. In addition, samples grown on 10° misoriented substrates exhibit a clearly ridge on the surface.

  10. Two orders of magnitude reduction in the temperature dependent resistivity of Ga1-xMnxAs grown on (6 3 1) GaAs insulating substrates

    NASA Astrophysics Data System (ADS)

    Rangel-Kuopp, Victor-Tapio; Martinez-Velis, Isaac; Gallardo-Hernandez, Salvador; Lopez-Lopez, Maximo


    The temperature dependent van der Pauw (T-Pauw) technique was used to investigate the resistivity of three Ga1-xMnxAs layers grown on (6 3 1) GaAs semi-insulating substrates. The samples had Mn concentration of 3.52×l020 cm-3, 5.05×1020 cm-3 and 1.12×l021 cm-3, corresponding to Mn cell effusion temperature TMn of 700 °C, 715 °C and 745 °C, respectively. They were compared to samples grown under the same conditions but on (0 0 1) GaAs semi-insulating substrates. For the sample grown at TMn=700 °C on a (6 3 1) substrate, a two orders of magnitude decrease in the resistivity is observed, when compared with the sample grown on a (0 0 1) substrate. For the sample grown at TMn=715 °C the decrease is approximately four times, while for the sample grown at TMn=745 °C the decrease is approximately forty times. We plotted the resistivities as a function of temperature in Arrhenius plots, where we extracted two activation energies, the smallest one between 6 and 11 meV, and the largest one between 25 and 183 meV. Both activation energies increased as TMn increased. These results are in agreement with SIMS analysis where we observed that manganese concentration in the (6 3 1) orientation growth is around two order of magnitude larger than in the samples grown in the (0 0 1) orientation substrate.

  11. Small signal model parameters analysis of GaN and GaAs based HEMTs over temperature for microwave applications

    NASA Astrophysics Data System (ADS)

    Alim, Mohammad A.; Rezazadeh, Ali A.; Gaquiere, Christophe


    Thermal and small-signal model parameters analysis have been carried out on 0.5 μm × (2 × 100 μm) AlGaAs/GaAs HEMT grown on semi-insulating GaAs substrate and 0.25 μm × (2 × 100 μm) AlGaN/GaN HEMT grown on SiC substrate. Two different technologies are investigated in order to establish a detailed understanding of their capabilities in terms of frequency and temperature using on-wafer S-parameter measurement over the temperature range from -40 to 150 °C up to 50 GHz. The equivalent circuit parameters as well as their temperature-dependent behavior of the two technologies were analyzed and discussed for the first time. The principle elevation or degradation of transistor parameters with temperature demonstrates the great potential of GaN device for high frequency and high temperature applications. The result provides some valuable insights for future design optimizations of advanced GaN and a comparison of this with the GaAs technology.

  12. Epitaxial Fe on free-standing GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Yang, Mingze; Darbandi, Ali; Majumder, Sarmita; Watkins, Simon; Kavanagh, Karen


    Epitaxial Fe contacts have been fabricated onto the top half of free-standing, Te-doped GaAs nanowires (NWs) via electrodeposition. Electrical isolation from the substrate via a polymeric layer enabled the measurement of electrical transport through individual wires. Using a fixed probe within a scanning electron microscope, an average metal-semiconductor diode barrier height of 0.69 ± 0.03 eV (ideality factor 1.48 ± 0.02) was found.

  13. Localized corrosion of GaAs surfaces and formation of porous GaAs

    SciTech Connect

    Schmuki, P.; Vitus, C.M.; Isaacs, H.S.; Fraser, J.; Graham, M.J.


    The present work deals with pitting corrosion of p- and n-type GaAs (100). Pit growth can be electrochemically initiated on both conduction types in chloride-containing solutions and leads after extended periods of time to the formation of a porous GaAs structure. In the case of p-type material, localized corrosion is only observed if a passivating film is present on the surface, otherwise -- e.g. in acidic solutions -- the material suffers from a uniform attack (electropolishing) which is independent of the anion present. In contrast, pitting corrosion of n-type material can be triggered independent of the presence of an oxide film. This is explained in terms of the different current limiting factor for the differently doped materials (oxide film in the case of the p- and a space charge layer in the case of the n-GaAs). The porous structure was characterized by SEM, EDX and AES, and consists mainly of GaAs. From scratch experiments it is clear that the pit initiation process is strongly influenced by surface defects. For n-type material, AFM investigations show that light induced roughening of the order of several hundred nm occurs under non-passivating conditions. This nm- scale roughening however does not affect the pitting process.

  14. Characterization of Si volume- and delta-doped InGaAs grown by molecular beam epitaxy

    SciTech Connect

    Fedoryshyn, Y.; Kaspar, P.; Jaeckel, H.; Beck, M.


    Bulk InGaAs layers were grown at 400 deg. C lattice-matched to InP semi-insulating substrates by molecular beam epitaxy. Si doping of the layers was performed by applying volume- and delta-doping techniques. The samples were characterized by capacitance-voltage, van der Pauw-Hall, secondary ion mass spectroscopy and photoluminescence measurements. Good agreement in terms of dependence of mobility and Burstein-Moss shift shift on doping concentration in samples doped by the two different techniques was obtained. Amphoteric behavior of Si was observed at doping concentrations higher than {approx}2.9x10{sup 19} cm{sup -3} in both delta- and volume-doped samples. Degradation of InGaAs crystalline quality occurred in samples with Si concentrations higher than {approx}4x10{sup 19} cm{sup -3}.

  15. The OAs defect in GaAs: A hybrid density functional study

    NASA Astrophysics Data System (ADS)

    Colleoni, Davide; Pasquarello, Alfredo


    The O center substitutional to As (OAs) is addressed through hybrid functional calculations as a candidate defect to explain the Fermi-level pinning in oxygen-doped GaAs. The defect center shows amphoteric behavior which could lead to Fermi-level pinning. However, the calculated charge transition levels only moderately agree with the experimental pinning level. Furthermore, the first-neighbor shell of the O atom and the absence of negative-U behavior clearly contrast with the experimental characterization. Thus, the present results do not support the OAs center as origin of the observed Fermi-level pinning in oxygen-doped GaAs.

  16. THz wave emission of GaAs induced by He+ ion implantation

    NASA Astrophysics Data System (ADS)

    Yang, Kang; Cao, Jianqing; Huang, Can; Ji, Te; Zhang, Zengyan; Liu, Qi; Wu, Shengwei; Lin, Jun; Zhao, Hongwei; Zhu, Zhiyong


    Semi-Insulating Gallium Arsenide (SI-GaAs) was implanted with 1.5 MeV He+ ions and THz photoconductive antenna (PCA) was prepared on the implanted SI-GaAs surface. The antenna was applied as the THz wave emission source of a terahertz time domain spectroscopy (THz-TDS) and the THz wave emission ability was studied as a function of the implantation dose. It is found that the THz signal intensity increases with increase of implantation dose, and after reaching to a peak value the THz signal intensity decreases with further implantation. The best THz emission ability was achieved at a dose value between 1 × 1015 and 1 × 1016 ions/cm2. It is believed that the implantation induced defects in the 1 μm-thick surface area are responsible for the enhanced THz emission ability. The work proved that better THz photoconductive antenna than that made by low-temperature-grown GaAs (LT-GaAs) can be produced through He-ion implantation at proper dose.

  17. Breakover mechanism of GaAs photoconductive switch triggering spark gap for high power applications

    NASA Astrophysics Data System (ADS)

    Tian, Liqiang; Shi, Wei; Feng, Qingqing


    A spark gap (SG) triggered by a semi-insulating GaAs photoconductive semiconductor switch (PCSS) is presented. Currents as high as 5.6 kA have been generated using the combined switch, which is excited by a laser pulse with energy of 1.8 mJ and under a bias of 4 kV. Based on the transferred-electron effect and gas streamer theory, the breakover characteristics of the combined switch are analyzed. The photoexcited carrier density in the PCSS is calculated. The calculation and analysis indicate that the PCSS breakover is caused by nucleation of the photoactivated avalanching charge domain. It is shown that the high output current is generated by the discharge of a high-energy gas streamer induced by the strong local electric field distortion or by overvoltage of the SG resulting from quenching of the avalanching domain, and periodic oscillation of the current is caused by interaction between the gas streamer and the charge domain. The cycle of the current oscillation is determined by the rise time of the triggering electric pulse generated by the PCSS, the pulse transmission time between the PCSS and the SG, and the streamer transit time in the SG.

  18. Performance analysis of undoped cylindrical gate all around (GAA) MOSFET at subthreshold regime

    NASA Astrophysics Data System (ADS)

    Jena, B.; Pradhan, K. P.; Dash, S.; Mishra, G. P.; Sahu, P. K.; Mohapatra, S. K.


    In this work the sensitivity of process parameters like channel length (L), channel thickness (tSi), and gate work function (φM) on various performance metrics of an undoped cylindrical gate all around (GAA) metal-oxide-semiconductor field effect transistor (MOSFET) are systematically analyzed. Undoped GAA MOSFET is a radical invention as it introduces a new direction for transistor scaling. In conventional MOSFET, generally the channel doping concentration is very high to provide high on-state current, but in contrary it causes random dopant fluctuation and threshold voltage variation. So, the undoped nature of GAA MOSFET solves the above complications. Hence, we have analyzed the electrical characteristics as well as the analog/RF performances of undoped GAA MOSFET through Sentaurus device simulator.

  19. Processing and characterization of epitaxial GaAs radiation detectors

    NASA Astrophysics Data System (ADS)

    Wu, X.; Peltola, T.; Arsenovich, T.; Gädda, A.; Härkönen, J.; Junkes, A.; Karadzhinova, A.; Kostamo, P.; Lipsanen, H.; Luukka, P.; Mattila, M.; Nenonen, S.; Riekkinen, T.; Tuominen, E.; Winkler, A.


    GaAs devices have relatively high atomic numbers (Z=31, 33) and thus extend the X-ray absorption edge beyond that of Si (Z=14) devices. In this study, radiation detectors were processed on GaAs substrates with 110 - 130 μm thick epitaxial absorption volume. Thick undoped and heavily doped p+ epitaxial layers were grown using a custom-made horizontal Chloride Vapor Phase Epitaxy (CVPE) reactor, the growth rate of which was about 10 μm / h. The GaAs p+/i/n+ detectors were characterized by Capacitance Voltage (CV), Current Voltage (IV), Transient Current Technique (TCT) and Deep Level Transient Spectroscopy (DLTS) measurements. The full depletion voltage (Vfd) of the detectors with 110 μm epi-layer thickness is in the range of 8-15 V and the leakage current density is about 10 nA/cm2. The signal transit time determined by TCT is about 5 ns when the bias voltage is well above the value that produces the peak saturation drift velocity of electrons in GaAs at a given thickness. Numerical simulations with an appropriate defect model agree with the experimental results.

  20. Thermal conductivity of bulk GaN—Effects of oxygen, magnesium doping, and strain field compensation

    SciTech Connect

    Simon, Roland B.; Anaya, Julian; Kuball, Martin


    The effect of oxygen doping (n-type) and oxygen (O)-magnesium (Mg) co-doping (semi-insulating) on the thermal conductivity of ammonothermal bulk GaN was studied via 3-omega measurements and a modified Callaway model. Oxygen doping was shown to significantly reduce thermal conductivity, whereas O-Mg co-doped GaN exhibited a thermal conductivity close to that of undoped GaN. The latter was attributed to a decreased phonon scattering rate due the compensation of impurity-generated strain fields as a result of dopant-complex formation. The results have great implications for GaN electronic and optoelectronic device applications on bulk GaN substrates.

  1. Sn-seeded GaAs nanowires grown by MOVPE.


    Sun, Rong; Vainorius, Neimantas; Jacobsson, Daniel; Pistol, Mats-Erik; Lehmann, Sebastian; Dick, Kimberly A


    It has previously been reported that in situ formed Sn nanoparticles can successfully initiate GaAs nanowire growth with a self-assembled radial p-n junction composed of a Sn-doped n-type core and a C-doped p-type shell. In this paper, we investigate the effect of fundamental growth parameters on the morphology and crystal structure of Sn-seeded GaAs nanowires. We show that growth can be achieved in a broad temperature window by changing the TMGa precursor flow simultaneously with decreasing temperature to prevent nanowire kinking at low temperatures. We find that changes in the supply of both AsH3 and TMGa can lead to nanowire kinking and that the formation of twin planes is closely related to a low V/III ratio. From PL results, we observe an increase of the average luminescence energy induced by heavy doping which shifts the Fermi level into the conduction band. Furthermore, the doping level of Sn and C is dependent on both the temperature and the V/III ratio. These results indicate that using Sn as the seed particle for nanowire growth is quite different from traditionally used Au in for example growth conditions and resulting nanowire properties. Thus, it is very interesting to explore alternative metal seed particles with controllable introduction of other impurities. PMID:27087548

  2. Sn-seeded GaAs nanowires grown by MOVPE

    NASA Astrophysics Data System (ADS)

    Sun, Rong; Vainorius, Neimantas; Jacobsson, Daniel; Pistol, Mats-Erik; Lehmann, Sebastian; Dick, Kimberly A.


    It has previously been reported that in situ formed Sn nanoparticles can successfully initiate GaAs nanowire growth with a self-assembled radial p–n junction composed of a Sn-doped n-type core and a C-doped p-type shell. In this paper, we investigate the effect of fundamental growth parameters on the morphology and crystal structure of Sn-seeded GaAs nanowires. We show that growth can be achieved in a broad temperature window by changing the TMGa precursor flow simultaneously with decreasing temperature to prevent nanowire kinking at low temperatures. We find that changes in the supply of both AsH3 and TMGa can lead to nanowire kinking and that the formation of twin planes is closely related to a low V/III ratio. From PL results, we observe an increase of the average luminescence energy induced by heavy doping which shifts the Fermi level into the conduction band. Furthermore, the doping level of Sn and C is dependent on both the temperature and the V/III ratio. These results indicate that using Sn as the seed particle for nanowire growth is quite different from traditionally used Au in for example growth conditions and resulting nanowire properties. Thus, it is very interesting to explore alternative metal seed particles with controllable introduction of other impurities.

  3. Basic properties of GaAs oxide generated by scanning probe microscope tip-induced nano-oxidation process

    NASA Astrophysics Data System (ADS)

    Okada, Yoshitaka; Iuchi, Yoshimasa; Kawabe, Mitsuo; Harris, James S.


    The basic properties of GaAs oxide generated by atomic force microscope (AFM) tip-induced nano-oxidation process have been investigated. The chemical analysis of the AFM tip-generated GaAs oxide was performed by using scanning microprobe x-ray photoelectron spectroscopy, and the main constituents of GaAs anodic oxide were determined to be Ga2O3 and As2O3. The electrical characterization showed that the electron transport across a GaAs oxide nanodot of ˜5.7 nm thickness, from a doped n+-Si tip into the n+-GaAs substrate follows the Fowler-Nordheim tunneling mechanism over a range of applied bias. Further, the tip-generated GaAs oxide nanodots were found to withstand moderate thermal treatments, but some volume reduction was observed.

  4. Experimental studies of the charge limit phenomenon in NEA GaAs photocathodes

    SciTech Connect

    Tang, H.; Alley, R.K.; Aoyagi, H.; Clendenin, J.E.; Frisch, J.C.; Mulhollan, G.A.; Saez, P.J.; Schultz, D.C.; Turner, J.L.


    Negative electron affinity GaAs photocathodes have been in continuous use at SLAC for generating polarized electron beams since early 1992. If the quantum efficiency of a GaAs cathode is below a critical value, the maximum photoemitted charge with photons of energies close to the band gap in a 2-ns pulse is found to be limited by the intrinsic properties of the cathode instead of by the space charge limit. We have studied this novel charge limit phenomenon in a variety of GaAs photocathodes of different structures and doping densities. We find that the charge limit is strongly dependent on the cathode`s quantum efficiency and the extraction electric field, and to a lesser degree on the excitation laser wavelength. In addition, we show that the temporal behavior of the charge limit depends critically on the doping density.

  5. Strong carrier lifetime enhancement in GaAs nanowires coated with semiconducting polymer.


    Yong, Chaw Keong; Noori, Keian; Gao, Qiang; Joyce, Hannah J; Tan, H Hoe; Jagadish, Chennupati; Giustino, Feliciano; Johnston, Michael B; Herz, Laura M


    The ultrafast charge carrier dynamics in GaAs/conjugated polymer type II heterojunctions are investigated using time-resolved photoluminescence spectroscopy at 10 K. By probing the photoluminescence at the band edge of GaAs, we observe strong carrier lifetime enhancement for nanowires blended with semiconducting polymers. The enhancement is found to depend crucially on the ionization potential of the polymers with respect to the Fermi energy level at the surface of the GaAs nanowires. We attribute these effects to electron doping by the polymer which reduces the unsaturated surface-state density in GaAs. We find that when the surface of nanowires is terminated by native oxide, the electron injection across the interface is greatly reduced and such surface doping is absent. Our results suggest that surface engineering via π-conjugated polymers can substantially improve the carrier lifetime in nanowire hybrid heterojunctions with applications in photovoltaics and nanoscale photodetectors. PMID:23171081

  6. Formation and properties of porous GaAs

    SciTech Connect

    Schmuki, P.; Lockwood, D.J.; Fraser, J.W.; Graham, M.J.; Isaacs, H.S.


    Porous structures on n-type GaAs (100) can be grown electrochemically in chloride-containing solutions. Crystallographic etching of the sample is a precursor stage of the attack. Polarization curves reveal the existanece of a critical onset potential for por formation (PFP). PFP is strongly dependent on the doping level of the sample and presence of surface defects. Good agreement between PFP and breakdown voltage of the space charge layer is found. Surface analysis by EDX, AES, and XPS show that the porous structure consists mainly of GaAs and that anion uptake in the structure can only observed after attackhas been initiated. Photoluminescence measurements reveal (under certain conditions) visible light emission from the porous structure.

  7. Structural and optical characterization of GaN nanostructures formed by using N+ implantation into GaAs at various temperature

    NASA Astrophysics Data System (ADS)

    Woo, Hyung-Joo; Kim, Gi-Dong; Choi, Han-Woo; Kim, Joon-Kon


    We have investigated the evolution of GaN phase nanocrystallite formation in a GaAs matrix by using nitrogen-ion implantation and subsequent rapid thermal annealing. A semi-insulating GaAs (100) wafer was implanted with 50-keV nitrogen ions at fluences in the range of 0.5 ˜ 4.0 × 1017 cm-2 at temperatures of room temperature, 500 °C and 700 °C, followed by post-implantation annealing at 500 ˜ 900 °C under a pure nitrogen gas flow. In the case of high-temperature implantation, there were no significant changes in the UV-VIS absorption spectra after high-temperature annealing compared with the spectra of the as-implanted sample. On the other hand, microscopic blistering and/or exfoliation is preferred after post-implantation annealing at high temperatures above 600 °C. As a consequence, low-temperature implantation (<200 °C is recommended in order to keep a morphologically-clean sample surfaces especially at an implantation fluence of 2 × 1017 cm-2 or more. Formation of nanometer-sized GaN crystallites was confirmed by using X-ray diffraction, cross-sectional transmission electron microscopy and low-temperature photoluminescence spectroscopy, and the effects of different annealing conditions on the evolution of the structures of the crystallites are described.

  8. GaAs Blocked-Impurity-Band Detectors for Far-Infrared Astronomy

    SciTech Connect

    Cardozo, Benjamin Lewin


    High-purity and doped GaAs films have been grown by Liquid-phase epitaxy (LPE) for development of a blocked impurity band (BIB) detector for far-infrared radiation. The film growth process developed has resulted in the capability to grow GaAs with a net active impurity concentration below 1 x 10{sup 13} cm{sup -3}, ideal for the blocking layer of the BIB detector. The growth of n-type LPE GaAs films with donor concentrations below the metal-insulator transition, as required for the absorbing layer of a BIB detector, has been achieved. The control of the donor concentration, however, was found to be insufficient for detector production. The growth by LPE of a high-purity film onto a commercially grown vapor-phase epitaxial (VPE) n-type GaAs doped absorbing layer resulted in a BIB device that showed a significant reduction in the low-temperature dark current compared to the absorbing layer only. Extended optical response was not detected, most likely due to the high compensation of the commercially grown GaAs absorbing layer, which restricts the depletion width of the device.

  9. Investigation of the optical and electrical properties of p-type porous GaAs structure

    NASA Astrophysics Data System (ADS)

    Saghrouni, H.; Missaoui, A.; Hannachi, R.; Beji, L.


    Porous GaAs layers have been formed by electrochemical anodic etching of (1 0 0) heavily doped p-type GaAs substrate in a HF:C2H5OH solution. The surface morphology of porous GaAs has been studied using atomic force microscopy (AFM). Nano-structural nature of the porous layer has been demonstrated by X-ray diffraction analysis (XRD) and confirmed by AFM. An estimation of the main size of the GaAs crystallites obtained from effective mass theory and based on PL data was close to the lowest value obtained from the AFM results. The porous p-GaAs samples are characterised by spectroscopic ellipsometry and modulation spectroscopy techniques. The objective of this study is to determine the porosity, refractive index, and thickness. The porosity of GaAs determined by atomic force microscopy confirmed by the value obtained from the spectroscopic ellipsometry. In fact the current-voltage I(V) characteristics of metal-semiconductor Au/p-GaAs are investigated and compared with Au/p-porous GaAs structures. From the forward bias I(V) characteristics of these devices, the main electrical parameters such as ideality factor, barrier height, and series resistance have been determined.

  10. Fracture mechanics evaluation of GaAs

    NASA Technical Reports Server (NTRS)

    Chen, C. P.


    A data base of mechanical and fracture properties for GaAs was generated. The data for single crystal GaAs will be used to design reusable GaAs solar modules. Database information includes; (1) physical property characterizations; (2) fracture behavior evaluations; and (3) strength of cells determined as a function of cell processing and material parameters.

  11. Epitaxial two-dimensional nitrogen atomic sheet in GaAs

    SciTech Connect

    Harada, Yukihiro Yamamoto, Masuki; Baba, Takeshi; Kita, Takashi


    We have grown an epitaxial two-dimensional nitrogen (N) atomic sheet in GaAs by using the site-controlled N δ-doping technique. We observed a change of the electronic states in N δ-doped GaAs from the isolated impurity centers to the delocalized impurity band at 1.49 eV with increasing N-doping density. According to the excitation-power- and temperature-dependent photoluminescence (PL) spectra, the emission related to localized levels below the impurity band edge was dominant at low excitation power and temperature, whereas the effects of the localized levels can be neglected by increasing the excitation power and temperature. Furthermore, a clear Landau shift of the PL-peak energy was observed at several Tesla in the Faraday configuration, in contrast to the case in the impurity limit.

  12. Biexciton emission from single isoelectronic traps formed by nitrogen-nitrogen pairs in GaAs

    SciTech Connect

    Takamiya, Kengo; Fukushima, Toshiyuki; Yagi, Shuhei; Hijikata, Yasuto; Yaguchi, Hiroyuki; Mochizuki, Toshimitsu; Yoshita, Masahiro; Akiyama, Hidefumi; Kuboya, Shigeyuki; Onabe, Kentaro; Katayama, Ryuji


    We have studied photoluminescence (PL) from individual isoelectronic traps formed by nitrogen-nitrogen (NN) pairs in GaAs. Sharp emission lines due to exciton and biexciton were observed from individual isoelectronic traps in nitrogen atomic-layer doped (ALD) GaAs. The binding energy of biexciton bound to individual isoelectronic traps was approximately 8 meV. Both the exciton and biexciton luminescence lines show completely random polarization and no fine-structure splitting. These results are desirable to the application to the quantum cryptography used in the field of quantum information technology.

  13. GaAs Schottky barrier varactor diodes for submillimeter wavelength power generation

    NASA Technical Reports Server (NTRS)

    Crowe, T. W.; Peatman, W. C. B.; Winkler, E.


    The development of GaAs Schottky barrier diodes for frequencies well into the submillimeter wavelength range is discussed. These devices have the highest cutoff frequencies yet obtained for varactor diodes and have produced sufficient output power to drive Schottky mixers at frequencies as high as 640 GHz. The fundamental design tradeoff between cutoff frequency and capacitance modulation is explored. As the doping density is increased and the anode diameter is reduced, the dynamic cutoff frequency increases, reaching a maximum of roughly 5 THz. It is concluded that the maximum output frequency from harmonic multipliers based on standard GaAs varactor diodes will be about 1 THz.

  14. Amphoteric behavior of Ge in GaAs: an LDA analysis

    NASA Astrophysics Data System (ADS)

    Giorgi, G.; Yamashita, K.


    We have studied the stability of neutral and charged Ge substitutional defects (donor, acceptor and molecular) in bulk GaAs host. To correct the severe underestimation given by the local density approximation (LDA) in predicting bandgaps, we have applied the LDA + U scheme (Dudarev et al 1998 Phys. Rev. B 57 1505) to the gallium d orbitals. We have aligned the LDA calculated band edges of GaAs to those calculated at LDA + U level. Then, we have corrected the thermal ionization energies (LDA derived) for the defects considered. The effect of atomic distance in the self-compensation mechanism in the case of Ge2 donor-acceptor defective cells was evaluated. Our results are compared with previous results on IV-doped III-V alloys. We found that self-passivation is the main mechanism for the thermodynamic stabilization of both defective cells and alloys. We have established a relationship between the energy of stabilization versus (1) the amount of molecular Ge2 in the alloys and (2) the distance between Ge donor-acceptor atoms in the supercells, finding an almost linear relationship. We conclude that Ge2-doped GaAs defective systems behave as extremely diluted (GaAs)1-xGe2x alloys (x → 0).

  15. MeV implantation studies in LPE (liquid phase epitaxy)-grown GaAs and InP. Final report, 1 October 1987-31 March 1989

    SciTech Connect

    Park, Y.S.


    Research was conducted on growth and evaluation of high-quality gallium arsenide layers using liquid phase epitaxy (LPE) and on MeV ion-implantation processings of molecular beam epitaxy (MBE) grown GaInAs layers on GaAs and LPE-grown GaAs layers on GaAs. By a novel growth method i.e., isoelectronic doping of LPE GaAs layers with indium, high structural and electrical-quality layers were successfully grown. In the as-grown indium-doped LPE GaAs layers, the etch-pit density, rocking-curve FWHM, and the ideality factor of a Schottky diode improved significantly, showing an optimal In doping density of 2.4 x 10/sup 19/. The effects of MeV-ion bombardment in a strained but partially relaxed GaInAs epitaxial layers on GaAs were systematically investigated. Depending on the state of initial relaxation, film thickness, and incident ion-beam current, the lattice strain changed differently with the increasing ion-beam dose.

  16. Doping-induced suppression of dislocation formation in semiconductors

    SciTech Connect

    Walukiewicz, W.


    A mechanism explaining suppression of dislocation formation in doped semiconductors is proposed. The mechanism is based on the recently introduced concept of amphoteric native defects. It is shown that supersaturation of vacancylike defects depends on the Fermi energy and thus also on the doping level. The calculated dependence of supersaturation on the doping level quantitatively accounts for experimentally observed trends in dislocation suppression in GaAs and InP.

  17. Identification of oxygen-related midgap level in GaAs

    NASA Technical Reports Server (NTRS)

    Lagowski, J.; Lin, D. G.; Gatos, H. C.; Aoyama, T.


    An oxygen-related deep level ELO was identified in GaAs employing Bridgman-grown crystals with controlled oxygen doping. The activation energy of ELO is almost the same as that of the dominant midgap level: EL2. This fact impedes the identification of ELO by standard deep level transient spectroscopy. However, it was found that the electron capture cross section of ELO is about four times greater than that of EL2. This characteristic served as the basis for the separation and quantitative investigation of ELO employing detailed capacitance transient measurements in conjunction with reference measurements on crystals grown without oxygen doping and containing only EL2.

  18. Determination of carrier concentration and compensation microprofiles in GaAs

    NASA Technical Reports Server (NTRS)

    Jastrzebski, L.; Lagowski, J.; Walukiewicz, W.; Gatos, H. C.


    Simultaneous microprofiling of semiconductor free carrier, donor, and acceptor concentrations was achieved for the first time from the absolute value of the free carrier absorption coefficient and its wavelength dependence determined by IR absorption in a scanning mode. Employing Ge- and Si-doped melt-grown GaAs, striking differences were found between the variations of electron concentration and those of ionized impurity concentrations. These results showed clearly that the electronic characteristics of this material are controlled by amphoteric doping and deviations from stoichiometry rather than by impurity segregation.

  19. Effect of Bi isovalent dopants on the formation of homogeneous coherently strained InAs quantum dots in GaAs matrices

    SciTech Connect

    Peleshchak, R. M.; Guba, S. K.; Kuzyk, O. V.; Kurilo, I. V.; Dankiv, O. O.


    The distribution of hydrostatic strains in Bi{sup 3+}-doped InAs quantum dots embedded in a GaAs matrix are calculated in the context of the deformation-potential model. The dependences of strains in the material of spherical InAs quantum dots with substitutional (Bi {yields} As) and interstitial (Bi) impurities on the quantum-dot size are derived. The qualitative correlation of the model with the experiment is discussed. The data on the effect of doping on the morphology of self-assembled InAs:Bi quantum dots in a GaAs matrix are obtained.

  20. GaAs solar cell development

    NASA Technical Reports Server (NTRS)

    Knechtli, R. C.; Kamath, S.; Loo, R.


    The motivation for developing GaAs solar cells is based on their superior efficiency when compared to silicon cells, their lower degradation with increasing temperature, and the expectation for better resistance to space radiation damage. The AMO efficiency of GaAs solar cells was calculated. A key consideration in the HRL technology is the production of GaAs cells of large area (greater than 4 sg cm) at a reasonable cost without sacrificing efficiency. An essential requirement for the successful fabrication of such cells is the ability to grow epitaxially a uniform layer of high quality GaAs (buffer layer) on state-of-the-art GaAs substrates, and to grow on this buffer layer the required than layer of (AlGa)As. A modified infinite melt liquid phase epitaxy (LPE) growth technique is detailed.

  1. Intervalence-Band Absorption Saturation And Optically Induced Damage Of GaAs By Pulsed CO2 Laser Radiation

    NASA Astrophysics Data System (ADS)

    James, R. B.; Christie, W. H.; Eby, R. E.; Darken, L. S.; Mills, B. E.


    The absorption of CO2, laser radiation in p-type GaAs is dominated by direct free-hole transitions between states in the heavy- and light-hole bands. For laser intensities on the order of 10 MW/cm2, the absorption associated with these transitions in moderately Zn-doped GaAs begins to saturate in a manner predicted by an inhomogeneously broadened two-level model. For heavily Zn-doped samples (>1018 cm -3), large areas of the surface are found to melt at comparable laser energy densities, in contrast to the lightly doped samples in which the damage initially occurs in small localized sites. As the energy density of the CO2 laser radiation is progressively increased, the surface topography of the samples shows signs of ripple patterns, high local stress, vaporization of material, and exfoliation of solid GaAs fragments. X-ray emission data taken on the laser-melted samples show that there is a loss of As, compared to Ga, from the surface during the high temperature cycling. Secondary ion mass spectrometry (SIMS) measurements are used to study the diffusion of oxygen from the native oxide and the incorporation of trapped oxygen in the near-surface region of the GaAs samples that have been melted by a CO2 laser pulse. We find that oxygen trapping does occur, and that the amount and depth of the oxygen signal depends on the laser energy density and number of laser shots.

  2. Wafer Bonding and Epitaxial Transfer of GaSb-based Epitaxy to GaAs for Monolithic Interconnection of Thermophotovoltaic Devices

    SciTech Connect

    C.A. Wang; D.A. Shiau; P.G. Murphy; P.W. O'brien; R.K. Huang; M.K. Connors; A.C. Anderson; D. Donetsky; S. Anikeev; G. Belenky; D.M. Depoy; G. Nichols


    GaInAsSb/AlGaAsSb/InAsSb/GaSb epitaxial layers were bonded to semi-insulating GaAs handle wafers with SiO{sub x}/Ti/Au as the adhesion layer for monolithic interconnection of thermophotovoltaic (TPV) devices. Epitaxial transfer was completed by removal of the GaSb substrate, GaSb buffer, and InAsSb etch-stop layer by selective chemical etching. The SiO{sub x}/TiAu provides not only electrical isolation, but also high reflectivity and is used as an internal back-surface reflector. Characterization of wafer-bonded epitaxy by high-resolution x-ray diffraction and time-decay photoluminescence indicates minimal residual stress and enhancement in optical quality. 0.54-eV GaInAsSb cells were fabricated and monolithically interconnected in series. A 10-junction device exhibited linear voltage building with an open-circuit voltage of 1.8 V.

  3. Growth and characterization of Czochralski-grown n and p-type GaAs for space solar cell substrates

    NASA Technical Reports Server (NTRS)

    Chen, R. T.


    Progress in LEC (liquid encapsulated Czochralski) crystal growth techniques for producing high-quality, 3-inch-diameter, n- and p-type GaAs crystals suitable for solar cell applications is described. The LEC crystals with low dislocation densities and background impurities, high electrical mobilities, good dopant uniformity, and long diffusion lengths were reproducibly grown through control of the material synthesis, growth and doping conditions. The capability for producing these large-area, high-quality substrates should positively impact the manufacturability of highly efficiency, low cost, radiation-hard GaAs solar cells.

  4. Spin Hall Effect in Doped Semiconductor Structures

    NASA Astrophysics Data System (ADS)

    Tse, Wang-Kong; Das Sarma, Sankar


    We present a microscopic theory of the extrinsic spin Hall effect based on the diagrammatic perturbation theory. Side-jump (SJ) and skew-scattering (SS) contributions are explicitly taken into account to calculate the spin Hall conductivity, and we show their effects scale as σxy^SJ/σxy^SS ˜(/τ)/ɛF, where τ being the transport relaxation time. Motivated by recent experimental work we apply our theory to n-doped and p-doped 3D and 2D GaAs structures, obtaining analytical formulas for the SJ and SS contributions. Moreover, the ratio of the spin Hall conductivity to longitudinal conductivity is found as σs/σc˜10-3-10-4, in reasonable agreement with the recent experimental results of Kato et al. [Science 306, 1910 (2004)] in n-doped 3D GaAs system.

  5. Radiation effects in GaAs AMOS solar cells

    NASA Technical Reports Server (NTRS)

    Shin, B. K.; Stirn, R. J.


    The results of radiation damage produced in AMOS (Antireflecting-Metal-Oxide-Semiconductor) cells with Sb2O3 interfacial oxide layers by 1-MeV electrons are presented. The degradation properties of the cells as a function of irradiation fluences were correlated with the changes in their spectral response, C-V, dark forward, and light I-V characteristics. The active n-type GaAs layers were grown by the OM-CVD technique, using sulfur doping in the range between 3 x 10 to the 15th power and 7 x 10 to the 16th power/cu cm. At a fluence of 10 to the 16th power e/sq cm, the low-doped samples showed I sub sc degradation of 8% and V sub oc degradation of 8%. The high-doped samples showed I sub sc and V sub oc degradation of 32% and 1%, respectively, while the fill factor remained relatively unchanged for both. AMOS cells with water vapor-grown interfacial layers showed no significant change in V sub oc.

  6. Bismuth alloying properties in GaAs nanowires

    SciTech Connect

    Ding, Lu; Lu, Pengfei; Cao, Huawei; Cai, Ningning; Yu, Zhongyuan; Gao, Tao; Wang, Shumin


    First-principles calculations have been performed to investigate the structural, electronic and optical properties of bismuth alloying in GaAs nanowires. A typical model of Ga{sub 31}As{sub 31} nanowires is introduced for its reasonable band gap. The band gap of GaAs{sub 1−x}Bi{sub x} shrinks clearly with the increasing Bi concentration and the band edge shifts when spin–orbit coupling (SOC) is considered. The insertion of Bi atom leads to hybridization of Ga/As/Bi p states which contributes a lot around Fermi level. Scissor effect is involved. The optical properties are presented, including dielectric function, optical absorption spectra and reflectivity, which are also varied with the increasing of Bi concentrations. - Graphical abstract: Top view of Bi-doped GaAs nanowires. Ga, As, and Bi atoms are denoted with grey, purple and red balls, respectively. Display Omitted - Highlights: • A typical model of Ga{sub 31}As{sub 31} nanowires is introduced for its reasonable band gap. • The band gap of GaAs{sub 1−x}Bi{sub x} shrinks clearly with the increasing Bi concentration. • The band edge shifts when spin–orbit coupling (SOC) is considered. • The insertion of Bi atom leads to hybridization of Ga/As/Bi p states.

  7. Simulation of quantum dots size and spacing effect for intermediate band solar cell application based on InAs quantum dots arrangement in GaAs

    SciTech Connect

    Hendra, P. I. B. Rahayu, F. Darma, Y.


    Intermediate band solar cell (IBSC) has become a promising technology in increasing solar cell efficiency. In this work we compare absorption coefficient profile between InAs quantum dots with GaAs bulk. We calculate the efficiency of GaAs bulk and GaAs doped with 2, 5, and 10 nm InAs quantum dot. Effective distances in quantum dot arrangement based on electron tunneling consideration were also calculated. We presented a simple calculation method with low computing power demand. Results showed that arrangement of quantum dot InAs in GaAs can increase solar cell efficiency from 23.9 % initially up to 60.4%. The effective distance between two quantum dots was found 2 nm in order to give adequate distance to prevent electron tunneling and wave functions overlap.

  8. High-Performance GaAs Nanowire Solar Cells for Flexible and Transparent Photovoltaics.


    Han, Ning; Yang, Zai-xing; Wang, Fengyun; Dong, Guofa; Yip, SenPo; Liang, Xiaoguang; Hung, Tak Fu; Chen, Yunfa; Ho, Johnny C


    Among many available photovoltaic technologies at present, gallium arsenide (GaAs) is one of the recognized leaders for performance and reliability; however, it is still a great challenge to achieve cost-effective GaAs solar cells for smart systems such as transparent and flexible photovoltaics. In this study, highly crystalline long GaAs nanowires (NWs) with minimal crystal defects are synthesized economically by chemical vapor deposition and configured into novel Schottky photovoltaic structures by simply using asymmetric Au-Al contacts. Without any doping profiles such as p-n junction and complicated coaxial junction structures, the single NW Schottky device shows a record high apparent energy conversion efficiency of 16% under air mass 1.5 global illumination by normalizing to the projection area of the NW. The corresponding photovoltaic output can be further enhanced by connecting individual cells in series and in parallel as well as by fabricating NW array solar cells via contact printing showing an overall efficiency of 1.6%. Importantly, these Schottky cells can be easily integrated on the glass and plastic substrates for transparent and flexible photovoltaics, which explicitly demonstrate the outstanding versatility and promising perspective of these GaAs NW Schottky photovoltaics for next-generation smart solar energy harvesting devices. PMID:26284305

  9. Design and optimization of GaAs photovoltaic converter for laser power beaming

    NASA Astrophysics Data System (ADS)

    Shan, Tiqiang; Qi, Xinglin


    GaAs photovoltaic (PV) converters are useful for the conversion of monochromatic light into electrical power in numerous military and industrial applications. The work of this paper is to design a monochromatic GaAs PV converter for coupling to laser beams in the wavelength of 790-840 nm and optimize its structure, layer thicknesses, doping levels of the emitter and base, and antireflection coating. Modeling calculations of the GaAs PV converter optimization are carried out using PC-1D. From the highest efficiency point of view, the best wavelength is 840 nm at which the optimized structure gives an efficiency of 61.8% theoretically. Experiment results under 808 nm laser power beaming show that high optical-to-electrical conversion efficiency of 53.23% at 5 W/cm2 is achieved using the optimized GaAs PV laser converter. Finally, accurate extraction of the key parameters, viz. the ideality factor, reverse saturation current, series resistance and shunt resistance is introduced. Variations of these parameters with illumination intensity are also investigated analytically based on the one diode model, which are necessary for the design of a high performance PV generation system.

  10. Formation of oxides and their role in the growth of Ag nanoplates on GaAs substrates.

    SciTech Connect

    Sun, Y.; Gosztola, D.; Lei, C.; Haasch, R.; Center for Nanoscale Materials; Univ. of Illinois


    Simple galvanic reactions between highly doped n-type GaAs wafers and a pure aqueous solution of AgNO3 at room temperature provide an easy and efficient protocol to directly deposit uniform Ag nanoplates with tunable dimensions on the GaAs substrates. The anisotropic growth of the Ag nanoplates in the absence of surfactant molecules might be partially ascribed to the codeposition of oxides of gallium and arsenic, which are revealed by extensive data from electron microscopy, X-ray photoelectron spectroscopy, and Raman spectroscopy, during the growth of the Ag nanoplates. The electron microscopic characterization shows that each Ag nanoplate has a 'necked' geometry, that is, it pins on the GaAs lattices through only a tiny neck (with sizes of <10 nm). In addition, the as-grown Ag nanoplates exhibit strong enhancement toward Raman scattering of materials on (or around) their surfaces.

  11. Characterization of GaAs solar cells made by ion implantation and rapid thermal annealing using selective photoetching

    SciTech Connect

    van Sark, W.G.J.H.M.; Weyher, J.L.; Giling, L.J. ); de Potter, M.; van Rossum, M. )


    Shallow {ital n}-{ital p} GaAs solar cells have been made by implantation of Si into Zn-doped ({ital p}-type) GaAs substrates followed by rapid thermal annealing. The structure of the GaAs crystal has been determined by the DSL photoetching method (Diluted Sirtl-like etchants used with Light). It was found that implantation-induced-damage (revealed by DSL as microroughness and craters) was not removed after annealing for energies exceeding 60 keV. This leads to substrates that contain many precipitates, which appears to be disastrous for the fabrication of good solar cells. In addition, good cell performance is hampered by compensation effects in the {ital n}-{ital p} transition region and in the {ital n}-type layer itself.

  12. Temperature dependence of the photovoltage from Franz-Keldysh oscillations in a GaAs p+-i-n+ structure

    NASA Astrophysics Data System (ADS)

    Lee, Sang Jo; Sohn, Chang Won; Jo, Hyun-Jun; Han, Im Sik; Kim, Jong Su; Noh, Sam Kyu; Choi, Hyonkwang; Leem, Jae-Young


    The temperature dependences of the junction electric fields and photovoltage have been investigated for a GaAs p+-i-n+ structure by using photoreflectance (PR) spectroscopy. The electric field strength was examined through three types of Franz-Keldysh oscillation (FKO) analyses; then, the photovoltage was evaluated with respect to temperature in the range from 30 to 300 K. From the PR results, we observed two electric fields that are estimated to originate from two regions of FKOs in undoped GaAs and from the space charge region in highly-doped GaAs. The electric field under illumination decreased with decreasing temperature while the photovoltage obtained from the electric field increased. We also demonstrate that PR spectroscopy is a good method for investigating the photovoltaic effect in solar-cell structures.

  13. Double-doped double-strained modulation-doped field effect transistor: 3D-SMODFET

    NASA Astrophysics Data System (ADS)

    Martin, Glenn Harvey

    This dissertation reviews the operation of MODFETs and the current status they have achieved as the world's fastest transistor. The utilization of AlGaAs/InGaAs heterostructures in the MODFET has resulted in the wide spread use of PHEMTs in the microwave industry today. This structure's increasing popularity is mainly due to the improvement in the quality and price of GaAs substrates over the past ten years. As the cost of good semi-insulating GaAs substrates has dropped, economic forces and the industries' need for microwave applications (wireless market) have driven the PHEMT into the production line of many companies world wide. The cost advantages of monolithic integration has results in the wide spread applications of monolithic microwave integrated circuits (MMIC). The advantages of the AlInAs/InGaAs heterostructure are numerous and will be discussed in detail within this dissertation. The simple fact of this is the continued research in using the AlInAs/InGaAs heterostructure on GaAs substrates with the inherent problems of the large lattice mismatch. In this dissertation the careful optimization of the AlInAs/InGaAs heterostructure for use in MODFET structures is done. In reviewing epitaxial designs for AlInAs/InGaAs heterostructures it became clear that the common InP-based MODFET was not optimized. This conclusion is based on the fact when comparing the AlInAs/InGaAs MODFET to the AlGaAs/InGaAs PHEMT they received a lot of bang for the buck. The large conduction band discontinuity (Delta Esb{C}) of the AlInAs/InGaAs heterostructure allowed for simple quick designs to easily out perform the AlGaAs/InGaAs PHEMTs. Results of this careful optimization of the AlInAs/InGaAs MODFET on InP substrates are an exceptional industry record high 2DEG sheet charge of 8.4× 10sp{12} cmsp{-2} with a corresponding current of 1,850 mA/mm. This record high performance was been achieved through (i) the careful optimization of MBE growth of pseudomorphic heterojunctions, (ii

  14. High-efficiency, radiation-resistant GaAs space cells

    NASA Technical Reports Server (NTRS)

    Bertness, K. A.; Ristow, M. Ladle; Grounner, M.; Kuryla, M. S.; Werthen, J. G.


    Although many GaAs solar cells are intended for space applicatons, few measurements of cell degradation after radiation are available, particularly for cells with efficiencies exceeding 20 percent (one-sun, AMO). Often the cell performance is optimized for the highest beginning-of-life (BOL) efficiency, despite the unknown effect of such design on end-of-life (EOL) efficiencies. The results of a study of the radiation effects on p-n GaAs cells are presented. The EOL efficiency of GaAs space cell can be increased by adjusting materials growth parameters, resulting in a demonstration of 16 percent EOL efficiency at one-sun, AMO. Reducing base doping levels to below 3 x 10(exp 17)/cu m and decreasing emitter thickness to 0.3 to 0.5 micron for p-n cells led to significant improvements in radiation hardness as measured by EOL/BOL efficiency ratios for irradiation of 10(exp -15)/sq cm electrons at 1 MeV. BOL efficiency was not affected by changes in emitter thickness but did improve with lower base doping.

  15. Pulse transformer for GaAs laser

    NASA Technical Reports Server (NTRS)

    Rutz, E. M.


    High-radiance gallium arsenide (GaAs) laser operating at room temperature is utilized in optical navigation system. For efficient transformer-to-laser impedance match, laser should be connected directly to pulse transformer secondary winding.

  16. Carbon doping of III-V compound semiconductors

    SciTech Connect

    Moll, A.J.


    Focus of the study is C acceptor doping of GaAs, since C diffusion coefficient is at least one order of magnitude lower than that of other common p-type dopants in GaAs. C ion implantation results in a concentration of free holes in the valence band < 10% of that of the implanted C atoms for doses > 10{sup 14}/cm{sup 2}. Rutherford backscattering, electrical measurements, Raman spectroscopy, and Fourier transform infrared spectroscopy were amonth the techniques used. Ga co-implantation increased the C activation in two steps: first, the additional radiation damage creates vacant As sites that the implanted C can occupy, and second, it maintains the stoichiometry of the implanted layer, reducing the number of compensating native defects. In InP, the behavior of C was different from that in GaAs. C acts as n-type dopant in the In site; however, its incorporation by implantation was difficult to control; experiments using P co-implants were inconsistent. The lattice position of inactive C in GaAs in implanted and epitaxial layers is discussed; evidence for formation of C precipitates in GaAs and InP was found. Correlation of the results with literature on C doping in III-V semiconductors led to a phenomenological description of C in III-V compounds (particularly GaAs): The behavior of C is controlled by the chemical nature of C and the instrinsic Fermi level stabilization energy of the material.

  17. The effects of As overpressure and diffusion source on the diffusion of Mn in GaAs

    NASA Astrophysics Data System (ADS)

    Wu, C. H.; Hsieh, K. C.


    Data are presented to show the effect of As overpressure on the diffusion of Mn in GaAs using four different Mn sources. These sources include solid Mn thin film deposited directly on the GaAs substrate and Mn vapors from pure Mn, MnAs, and Mn3As solids. In the circumstance for which a solid Mn film is used as the diffusion source, a nonuniform doping distribution and poor surface morphology is obtained due to a reaction between the Mn film and the GaAs matrix. The degraded surface consists of a layer of polycrystalline cubic alloy having a lattice constant of nearly 8.4 Å and a composition close to MnGa2 with a small amount of As. Of the remaining diffusion sources (Mn, MnAs, and Mn3As), only MnAs consistently produces a uniform doping distribution and smooth surface morphology. For diffusions at 800 °C, a uniform surface hole carrier concentration as high as 1020/cm3 can be obtained using MnAs as the source. The As overpressure is found to drastically alter the Mn diffusion profile, and Mn, like Zn, may diffuse in GaAs interstitial-substitutionally. Vapor from both the Mn and Mn3As solids degrade the GaAs surface. Mn3As, however, uncharacteristically degrades the surface more rapidly although the details of such are not well understood. With the presence of a high As overpressure, however, both surfaces of the Mn and Mn3As sources are converted to (Mn,As) compounds, the compositions being close to MnAs. High enough As overpressures are shown to completely suppress the GaAs surface degradation which is evident when Mn3As alone is used as the diffusion source.

  18. Investigation of the origin of deep levels in CdTe doped with Bi

    SciTech Connect

    Saucedo, E.; Franc, J.; Elhadidy, H.; Horodysky, P.; Ruiz, C. M.; Bermudez, V.; Sochinskii, N. V.


    Combining optical (low temperature photoluminescence), electrical (thermoelectric effect spectroscopy), and structural (synchrotron X-ray powder diffraction) methods, the defect structure of CdTe doped with Bi was studied in crystals with dopant concentration in the range of 10{sup 17}-10{sup 19} at./cm{sup 3}. The semi-insulating state observed in crystals with low Bi concentration is assigned to the formation of a shallow donor level and a deep donor recombination center. Studying the evolution of lattice parameter with temperature, we postulate that the deep center is formed by a Te-Te dimer and their formation is explained by a tetrahedral to octahedral distortion, due to the introduction of Bi in the CdTe lattice. We also shows that this model agrees with the electrical, optical, and transport charge properties of the samples.

  19. Molecular beam epitaxial growth and characterization of GaSb layers on GaAs (0 0 1) substrates

    NASA Astrophysics Data System (ADS)

    Li, Yanbo; Zhang, Yang; Zhang, Yuwei; Wang, Baoqiang; Zhu, Zhanping; Zeng, Yiping


    We report on the growth of GaSb layers on GaAs (0 0 1) substrates by molecular beam epitaxy (MBE). We investigate the influence of the GaAs substrate surface treatment, growth temperature, and V/III flux ratios on the crystal quality and the surface morphology of GaSb epilayers. Comparing to Ga-rich GaAs surface preparation, the Sb-rich GaAs surface preparation can promote the growth of higher-quality GaSb material. It is found that the crystal quality, electrical properties, and surface morphology of the GaSb epilayers are highly dependent on the growth temperature, and Sb/Ga flux ratios. Under the optimized growth conditions, we demonstrate the epitaxial growth of high quality GaSb layers on GaAs substrates. The p-type nature of the unintentionally doped GaSb is studied and from the growth conditions dependence of the hole concentrations of the GaSb, we deduce that the main native acceptor in the GaSb is the Ga antisite (GaSb) defect.

  20. Optimisation of a carbon doped buffer layer for AlGaN/GaN HEMT devices

    NASA Astrophysics Data System (ADS)

    Gamarra, Piero; Lacam, Cedric; Tordjman, Maurice; Splettstösser, Jörg; Schauwecker, Bernd; di Forte-Poisson, Marie-Antoinette


    This work reports on the optimisation of carbon doping GaN buffer layer (BL) for AlGaN/GaN HEMT (high electron mobility transistor) structures, grown by low pressure metal-organic vapour phase epitaxy (LP-MOVPE) on 3 in. SiC semi-insulating substrates. The incorporation of carbon impurities in GaN is studied as a function of the growth conditions, without using an external carbon source. We observed that the C incorporation can be effectively controlled over more than one order of magnitude by tuning the reactor pressure and the growth temperature, without degradation of the crystalline properties of the GaN layers. HEMT structures with a specific barrier design were grown with different carbon dopings in the GaN BL and processed into transistors to evaluate the impact of the BL doping on the device performances. A significant improvement of the HEMT drain leakage current and of the breakdown voltage was obtained by increasing the carbon incorporation in the GaN BL. The RF performances of the devices show a trade-off between leakage currents and trapping phenomena which are enhanced by the use of carbon doping, limiting the delivered output power. An output power as high as 6.5 W/mm with a Power Added Efficiency of 70% has been achieved at 2 GHz by the HEMT structures with the lowest carbon doping in the BL.

  1. Sulfur passivation and contact methods for GaAs nanowire solar cells

    NASA Astrophysics Data System (ADS)

    Tajik, N.; Peng, Z.; Kuyanov, P.; LaPierre, R. R.


    The effect of sulfur passivation on core-shell p-n junction GaAs nanowire (NW) solar cells has been investigated. Devices of two types were investigated, consisting of indium tin oxide contact dots or opaque Au finger electrodes. Lateral carrier transport from the NWs to the contact fingers was achieved via a p-doped GaAs surface conduction layer. NWs between the opaque contact fingers had sidewall surfaces exposed for passivation by sulfur. The relative cell efficiency increased by 19% upon passivation. The contribution of the thin film grown between the NWs to the total cell efficiency was estimated by removing the NWs using a sonication procedure. Mechanisms of carrier transport and photovoltaic effects are discussed on the basis of spatially resolved laser scanning measurements.

  2. Sulfur passivation and contact methods for GaAs nanowire solar cells.


    Tajik, N; Peng, Z; Kuyanov, P; LaPierre, R R


    The effect of sulfur passivation on core-shell p-n junction GaAs nanowire (NW) solar cells has been investigated. Devices of two types were investigated, consisting of indium tin oxide contact dots or opaque Au finger electrodes. Lateral carrier transport from the NWs to the contact fingers was achieved via a p-doped GaAs surface conduction layer. NWs between the opaque contact fingers had sidewall surfaces exposed for passivation by sulfur. The relative cell efficiency increased by 19% upon passivation. The contribution of the thin film grown between the NWs to the total cell efficiency was estimated by removing the NWs using a sonication procedure. Mechanisms of carrier transport and photovoltaic effects are discussed on the basis of spatially resolved laser scanning measurements. PMID:21454946

  3. High-efficiency thin-film GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Stirn, R. J.


    GaAs chemical vapor deposition (CVD) growth on single-crystal GaAs substrates was investigated over a temperature range of 600 to 750 C, As/GA mole-ratio range of 3 to 11, and gas molefraction range 5 x 10 to the minus 9th power to 7x 10 to the minus 7th power for H2S doping. GasAs CVD growth on recrystallized Ge films was investigated for a temperature range of 550 to 700 C, an As/GA mole ratio of 5, and for various H2S mole fraction. The highest efficiency cell observed on these films with 2 mm dots was 4.8% (8% when AR-coated). Improvements in fill factor and opencircuit voltage by about 40% each are required in order to obtain efficiencies of 15% or greater.

  4. Technological steps reduction in the fabrication of high efficiency GaAs solar cells

    NASA Astrophysics Data System (ADS)

    Gavand, M.; Mayet, L.; Montegu, B.; Laugier, A.

    A simplified method to make high-efficiency GaAs solar cells by isothermal liquid-phase epitaxy has been investigated. A graded GaAlAs window layer was grown by isothermal contact between a Be-doped GaAlAs melt and a n-type GaAs substrate. With the aim of further reducing the fabrication cost, attempts were made to grow the junction and the window on the as-cut side of the wafers; with small modifications in the cleaning process, efficiencies up to 20 percent were obtained. The following substrates were considered: polycrystalline, chemically/mechanically polished monocrystalline, and buffer layer. The best efficiency of 22.7 percent (under 24 suns AM1.5, 25 deg C) was obtained when buffer-layer substrates were used.

  5. Spin Hall Effect in Doped Semiconductor Structures

    NASA Astrophysics Data System (ADS)

    Tse, Wang-Kong; Das Sarma, S.


    In this Letter we present a microscopic theory of the extrinsic spin Hall effect based on the diagrammatic perturbation theory. Side-jump and skew-scattering contributions are explicitly taken into account to calculate the spin Hall conductivity, and we show that their effects scale as σxySJ/σxySS˜(ℏ/τ)/ɛF, with τ being the transport relaxation time. Motivated by recent experimental work we apply our theory to n- and p-doped 3D and 2D GaAs structures, obtaining σs/σc˜10-3-10-4, where σs(c) is the spin Hall (charge) conductivity, which is in reasonable agreement with the recent experimental results of Kato et al. [Science 306, 1910 (2004)]SCIEAS0036-807510.1126/science.1105514 in n-doped 3D GaAs system.

  6. Ultra-Thin-Film GaAs Solar Cells

    NASA Technical Reports Server (NTRS)

    Wang, K. L.; Shin, B. K.; Yeh, Y. C. M.; Stirn, R. J.


    Process based on organo-metallic chemical vapor deposition (OM/CVD) of trimethyl gallium with arsine forms economical ultrathin GaAs epitaxial films. Process has higher potential for low manufacturing cost and large-scale production compared with more-conventional halide CVD and liquid-phase epitaxy processes. By reducing thickness of GaAs and substituting low-cost substrate for single-crystal GaAs wafer, process would make GaAs solar cells commercially more attractive.

  7. Doped semiconductors and other solar energy materials

    NASA Astrophysics Data System (ADS)

    Williamson, D. L.


    A review is presented of recent applications of Mössbauer spectroscopy that focus on determining the fate of doped impurities in semiconductors, primarily GaAs, Ga1-xAlxAs and Si. Other solar energy materials and processes which are discussed include amorphous Si∶H-based alloys, chalcopyrites, transparent conducting oxides, photochemical processing via semiconductor powders in electrolytes, mirror making, and plant photosynthesis.

  8. Crystal growth of device quality GaAs in space

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.


    The optimization of space processing of GaAs is described. The detailed compositional, structural, and electronic characterization of GaAs on a macro- and microscale and the relationships between growth parameters and the properties of GaAs are among the factors discussed. The key parameters limiting device performance are assessed.

  9. GaAs Solar Cell Radiation Handbook

    NASA Technical Reports Server (NTRS)

    Anspaugh, B. E.


    The handbook discusses the history of GaAs solar cell development, presents equations useful for working with GaAs solar cells, describes commonly used instrumentation techniques for assessing radiation effects in solar cells and fundamental processes occurring in solar cells exposed to ionizing radiation, and explains why radiation decreases the electrical performance of solar cells. Three basic elements required to perform solar array degradation calculations: degradation data for GaAs solar cells after irradiation with 1 MeV electrons at normal incidence; relative damage coefficients for omnidirectional electron and proton exposure; and the definition of the space radiation environment for the orbit of interest, are developed and used to perform a solar array degradation calculation.

  10. Optical and thermal properties of doped semiconductor

    NASA Astrophysics Data System (ADS)

    Abroug, S.; Saadallah, F.; Yacoubi, N.


    The knowledge of doping effects on optical and thermal properties of semiconductors is crucial for the development of optoelectronic compounds. The purpose of this work is to investigate theses effects by mirage effect technique and spectroscopic ellipsometry SE. The absorption spectra measured for differently doped Si and GaAs bulk samples, show that absorption in the near IR increases with dopant density and also the band gap shifts toward low energies. This behavior is due to free carrier absorption which could be obtained by subtracting phonon assisted absorption from the measured spectrum. This carrier absorption is related to the dopant density throw a semi-empirical model.