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Sample records for vlsi technology wafers

  1. Overlay Tolerances For VLSI Using Wafer Steppers

    NASA Astrophysics Data System (ADS)

    Levinson, Harry J.; Rice, Rory

    1988-01-01

    In order for VLSI circuits to function properly, the masking layers used in the fabrication of those devices must overlay each other to within the manufacturing tolerance incorporated in the circuit design. The capabilities of the alignment tools used in the masking process determine the overlay tolerances to which circuits can be designed. It is therefore of considerable importance that these capabilities be well characterized. Underestimation of the overlay accuracy results in unnecessarily large devices, resulting in poor utilization of wafer area and possible degradation of device performance. Overestimation will result in significant yield loss because of the failure to conform to the tolerances of the design rules. The proper methodology for determining the overlay capabilities of wafer steppers, the most commonly used alignment tool for the production of VLSI circuits, is the subject of this paper. Because cost-effective manufacturing process technology has been the driving force of VLSI, the impact on productivity is a primary consideration in all discussions. Manufacturers of alignment tools advertise the capabilities of their equipment. It is notable that no manufacturer currently characterizes his aligners in a manner consistent with the requirements of producing very large integrated circuits, as will be discussed. This has resulted in the situation in which the evaluation and comparison of the capabilities of alignment tools require the attention of a lithography specialist. Unfortunately, lithographic capabilities must be known by many other people, particularly the circuit designers and the managers responsible for the financial consequences of the high prices of modern alignment tools. All too frequently, the designer or manager is confronted with contradictory data, one set coming from his lithography specialist, and the other coming from a sales representative of an equipment manufacturer. Since the latter generally attempts to make his

  2. High speed synchronizer card utilizing VLSI technology

    NASA Technical Reports Server (NTRS)

    Speciale, Nicholas; Wunderlich, Kristin

    1988-01-01

    A generic synchronizer card capable of providing standard NASA communication block telemetry frame synchronization and quality control was fabricated using VLSI technology. Four VLSI chip sets are utilized to shrink all the required functions into a single synchronizer card. The application of VLSI technology to telemetry systems resulted in an increase in performance and a decrease in cost and size.

  3. Various Applications Of An Automated Wafer Inspection System In VLSI Manufacturing

    NASA Astrophysics Data System (ADS)

    Matsuda, Kimihiro; Takashima, Isamu; Aoki, Yasuo; Araki, Junichi

    1988-01-01

    Although the VLSI products produced in our manufacturing lines are mostly designed with 1 micron geometries, we expect the majority of products will shift to sub-micron design very soon. This article discusses results of our experiments to releaf human operators from the already difficult visual inspection tasks with a fully automated equipment. We have two groups of visual inspection tasks necessary on the VLSI manufacturing floor. One is Engineering Analysis and the other is in-line monitor, or Product Wafer Auditing. The former, Engineering Analysis, demands a variety of different measurements and inspections, such as line width, contact area, multilayer alignment precision and defect density. On the otherhand, Product Wafer Auditing, will need only one or two such functions per mo-nitoring point in the process, but will use the function more extensively, continuously, and repeatedly. In the manufacturing environment, where the ever pressing demand to increase yield is para-mount, it is crucial to reduce defect finding and analysing time. For that purpose, we need higher speed and accuracy for production wafer inspection than can be obtained with human inspectors. In this context, our experience on the KLA-2020, fully automated wafer inspection equipment has proven to be truely beneficial in the area of the following five different cases of evaluation of the KLA-2020, conducted in our plant. Case: 1. Visual inspection of the VLSI production wafer after aluminum dry-etching was studied in comparison with human operators. The result is that not only was the KLA-2020 much more thorough in detecting defects but also was much faster than any of the operators, by far. Case: 2. We applied the KLA-2020 to identify the cause of die, lost at probe test. We traced the killer defect, which was originated from the reticle. KLA-2020 is effective in reticle qualification. Case: 3. We found that the line-width instruments based upon laser scatterology cannot properly measure

  4. Full custom VLSI - A technology for high performance computing

    NASA Technical Reports Server (NTRS)

    Maki, Gary K.; Whitaker, Sterling R.

    1990-01-01

    Full custom VLSI is presented as a viable technology for addressing the need for the computing capabilities required for the real-time health monitoring of spacecraft systems. This technology presents solutions that cannot be realized with stored program computers or semicustom VLSI; also, it is not dependent on current IC processes. It is argued that, while design time is longer, full custom VLSI produces the fastest and densest VLSI solution and that high density normally also yields low manufacturing costs.

  5. Wafer level reliability for high-performance VLSI design

    NASA Technical Reports Server (NTRS)

    Root, Bryan J.; Seefeldt, James D.

    1987-01-01

    As very large scale integration architecture requires higher package density, reliability of these devices has approached a critical level. Previous processing techniques allowed a large window for varying reliability. However, as scaling and higher current densities push reliability to its limit, tighter control and instant feedback becomes critical. Several test structures developed to monitor reliability at the wafer level are described. For example, a test structure was developed to monitor metal integrity in seconds as opposed to weeks or months for conventional testing. Another structure monitors mobile ion contamination at critical steps in the process. Thus the reliability jeopardy can be assessed during fabrication preventing defective devices from ever being placed in the field. Most importantly, the reliability can be assessed on each wafer as opposed to an occasional sample.

  6. Strategy For Yield Control And Enhancement In VLSI Wafer Manufacturing

    NASA Astrophysics Data System (ADS)

    Neilson, B.; Rickey, D.; Bane, R. P.

    1988-01-01

    In most fully utilized integrated circuit (IC) production facilities, profit is very closely linked with yield. In even the most controlled manufacturing environments, defects due to foreign material are a still major contributor to yield loss. Ideally, an IC manufacturer will have ample engineering resources to address any problem that arises. In the real world, staffing limitations require that some tasks must be left undone and potential benefits left unrealized. Therefore, it is important to prioritize problems in a manner that will give the maximum benefit to the manufacturer. When offered a smorgasbord of problems to solve, most people (engineers included) will start with what is most interesting or the most comfortable to work on. By providing a system that accurately predicts the impact of a wide variety of defect types, a rational method of prioritizing engineering effort can be made. To that effect, a program was developed to determine and rank the major yield detractors in a mixed analog/digital FET manufacturing line. The two classical methods of determining yield detractors are chip failure analysis and defect monitoring on drop in test die. Both of these methods have short comings: 1) Chip failure analysis is painstaking and very time consuming. As a result, the sample size is very small. 2) Drop in test die are usually designed for device parametric analysis rather than defect analysis. To provide enough wafer real estate to do meaningful defect analysis would render the wafer worthless for production. To avoid these problems, a defect monitor was designed that provided enough area to detect defects at the same rate or better than the NMOS product die whose yield was to be optimized. The defect monitor was comprehensive and electrically testable using such equipment as the Prometrix LM25 and other digital testers. This enabled the quick accumulation of data which could be handled statistically and mapped individually. By scaling the defect densities

  7. Potential impact of VLSI technologies on guided missile design

    NASA Astrophysics Data System (ADS)

    Maurer, H. A.; Kongelbeck, K. S.

    1985-08-01

    Some aspects of the anticipated impact of emerging VLSI technologies on tactical missiles, present and future generations are discussed. VLSI evolution represents a unique example of a very dynamic and pervasive trend in commercial and military applications. It is our opinion, however, that the characteristics of this trend are quite different in tactical missiles, not only compared to commercial electronics but even to strategic or space missiles. Considering the particular objectives and constraints as they seem common to most tactical guided missiles and smart munitions, the VLSI technologies should be almost tailored to this application. However, there are some perequisites to be considered to make the introduction of VLSIs successful. Here are some examples: careful planning to be in step with the maturity of the VLSI technology, sensible selection of targets for insertion or new designs and - quite importantly - consideration of program stability in terms of volume, rates, and changes. From a technical viewpoint alone, the current trend to light and small, 4- to 8-inch-diameter configuration whether ground or air-launched encourages an early insertion of VLSIs. Electronic packaging with unusual form factors, e.g., having a central hole for warhead effectiveness, high density and low weight, and low power dissipation, poses conflicting requirements to the missile designer. With very few exceptions, such as in magnetics or battery chemistry, the electronics sections cannot benefit from other technological breakthroughs. It is the evolution of monolithic large scale integration of circuits on Silicon and to a lesser degree on Gallium Arsenide which bears the main load to meeting these criteria of processing density at minimum power dissipation, and of providing an ever-increasing functional throughput. Those VLSI embodiments which appear to be most likely to influence missile electronics are defined. They may be divided into four categories, with some ranking

  8. VLSI Technology: Impact and Promise. Identifying Emerging Issues and Trends in Technology for Special Education.

    ERIC Educational Resources Information Center

    Bayoumi, Magdy

    As part of a 3-year study to identify emerging issues and trends in technology for special education, this paper addresses the implications of very large scale integrated (VLSI) technology. The first section reviews the development of educational technology, particularly microelectronics technology, from the 1950s to the present. The implications…

  9. VLSI technology for smaller, cheaper, faster return link systems

    NASA Technical Reports Server (NTRS)

    Nanzetta, Kathy; Ghuman, Parminder; Bennett, Toby; Solomon, Jeff; Dowling, Jason; Welling, John

    1994-01-01

    Very Large Scale Integration (VLSI) Application-specific Integrated Circuit (ASIC) technology has enabled substantially smaller, cheaper, and more capable telemetry data systems. However, the rapid growth in available ASIC fabrication densities has far outpaced the application of this technology to telemetry systems. Available densities have grown by well over an order magnitude since NASA's Goddard Space Flight Center (GSFC) first began developing ASIC's for ground telemetry systems in 1985. To take advantage of these higher integration levels, a new generation of ASIC's for return link telemetry processing is under development. These new submicron devices are designed to further reduce the cost and size of NASA return link processing systems while improving performance. This paper describes these highly integrated processing components.

  10. GaAs VLSI technology and circuit elements for DSP

    NASA Astrophysics Data System (ADS)

    Mikkelson, James M.

    1990-10-01

    Recent progress in digital GaAs circuit performance and complexity is presented to demonstrate the current capabilities of GaAs components. High density GaAs process technology and circuit design techniques are described and critical issues for achieving favorable complexity speed power and cost tradeoffs are reviewed. Some DSP building blocks are described to provide examples of what types of DSP systems could be implemented with present GaAs technology. DIGITAL GaAs CIRCUIT CAPABILITIES In the past few years the capabilities of digital GaAs circuits have dramatically increased to the VLSI level. Major gains in circuit complexity and power-delay products have been achieved by the use of silicon-like process technologies and simple circuit topologies. The very high speed and low power consumption of digital GaAs VLSI circuits have made GaAs a desirable alternative to high performance silicon in hardware intensive high speed system applications. An example of the performance and integration complexity available with GaAs VLSI circuits is the 64x64 crosspoint switch shown in figure 1. This switch which is the most complex GaAs circuit currently available is designed on a 30 gate GaAs gate array. It operates at 200 MHz and dissipates only 8 watts of power. The reasons for increasing the level of integration of GaAs circuits are similar to the reasons for the continued increase of silicon circuit complexity. The market factors driving GaAs VLSI are system design methodology system cost power and reliability. System designers are hesitant or unwilling to go backwards to previous design techniques and lower levels of integration. A more highly integrated system in a lower performance technology can often approach the performance of a system in a higher performance technology at a lower level of integration. Higher levels of integration also lower the system component count which reduces the system cost size and power consumption while improving the system reliability

  11. Comparison of the radiation hardness of various VLSI technologies for defense applications

    SciTech Connect

    Gibbon, C.F.

    1985-01-01

    In this review the radiation hardness of various potential very large scale (VLSI) IC technologies is evaluated. IC scaling produces several countervailing trends. Reducing vertical dimensions tends to increase total dose hardness, while reducing lateral feature sizes may increase susceptibility to transient radiation effects. It is concluded that during the next decade at least, silicon complimentary MOS (CMOS), perhaps on an insulating substrate (SOI) will be the technology of choice for VLSI in defense systems.

  12. Deep sub-micron stud-via technology of superconductor VLSI circuits

    NASA Astrophysics Data System (ADS)

    Tolpygo, Sergey K.; Bolkhovsky, V.; Weir, T.; Johnson, L. M.; Oliver, W. D.; Gouker, M. A.

    2014-02-01

    A fabrication process has been developed for fully planarized Nb-based superconducting interlayer connections (vias) with minimum size down to 250 nm for superconductor very large scale integrated (VLSI) circuits with 8 and 10 superconducting layers on 200-mm wafers. Instead of etched contact holes in the interlayer dielectric it employs etched and planarized Nb pillars (studs) as connectors between adjacent wiring layers. Detailed results are presented for one version of the process that utilizes Nb/Al/Nb trilayers for each wiring layer instead of single Nb wiring layers. Nb studs are etched in the top layer of the trilayer to provide vertical connections between the wires etched in the bottom layer of the trilayer and the next wiring layer that is also deposited as a Nb/Al/Nb trilayer. This technology makes possible a dramatic increase in the density of superconducting digital circuits by reducing the area of interconnects with respect to presently utilized etched contact holes between superconducting layers and by enabling the use of stacked vias. Results on the fabrication and size dependence of electric properties of Nb studs with dimensions near the resolution limit of 248-nm photolithography are presented in the normal and superconducting states. Superconducting critical current density in the fabricated stud-vias is about 0.3 A μm-2 and approaches the depairing current density of Nb films.

  13. Deep sub-micron stud-via technology for superconductor VLSI circuits

    NASA Astrophysics Data System (ADS)

    Tolpygo, Sergey K.; Bolkhovsky, V.; Weir, T.; Johnson, L. M.; Oliver, W. D.; Gouker, M. A.

    2014-05-01

    A fabrication process has been developed for fully planarized Nb-based superconducting inter-layer connections (vias) with minimum size down to 250 nm for superconductor very large scale integrated (VLSI) circuits with 8 and 10 superconducting layers on 200-mm wafers. Instead of single Nb wiring layers, it utilizes Nb/Al/Nb trilayers for each wiring layer to form Nb pillars (studs) providing vertical connections between the wires etched in the bottom layer of the trilayer and the next wiring layer that is also deposited as a Nb/Al/Nb trilayer. This technology makes possible a dramatic increase in the density of superconducting digital circuits by reducing the area of interconnects with respect to presently utilized etched contact holes between superconducting layers and by enabling the use of stacked vias. Results on the fabrication and size dependence of electric properties of Nb studs with dimensions near the resolution limit of 248-nm photolithography are presented. Superconducting critical current density in the fabricated stud-vias is about 0.3 A/μm2 and approaches the depairing current density of Nb films.

  14. Monolithic active pixel sensors (MAPS) in a VLSI CMOS technology

    NASA Astrophysics Data System (ADS)

    Turchetta, R.; French, M.; Manolopoulos, S.; Tyndel, M.; Allport, P.; Bates, R.; O'Shea, V.; Hall, G.; Raymond, M.

    2003-03-01

    Monolithic Active Pixel Sensors (MAPS) designed in a standard VLSI CMOS technology have recently been proposed as a compact pixel detector for the detection of high-energy charged particle in vertex/tracking applications. MAPS, also named CMOS sensors, are already extensively used in visible light applications. With respect to other competing imaging technologies, CMOS sensors have several potential advantages in terms of low cost, low power, lower noise at higher speed, random access of pixels which allows windowing of region of interest, ability to integrate several functions on the same chip. This brings altogether to the concept of 'camera-on-a-chip'. In this paper, we review the use of CMOS sensors for particle physics and we analyse their performances in term of the efficiency (fill factor), signal generation, noise, readout speed and sensor area. In most of high-energy physics applications, data reduction is needed in the sensor at an early stage of the data processing before transfer of the data to tape. Because of the large number of pixels, data reduction is needed on the sensor itself or just outside. This brings in stringent requirements on the temporal noise as well as to the sensor uniformity, expressed as a Fixed Pattern Noise (FPN). A pixel architecture with an additional transistor is proposed. This architecture, coupled to correlated double sampling of the signal will allow cancellation of the two dominant noise sources, namely the reset or kTC noise and the FPN. A prototype has been designed in a standard 0.25 μm CMOS technology. It has also a structure for electrical calibration of the sensor. The prototype is functional and detailed tests are under way.

  15. Wafer-level vacuum/hermetic packaging technologies for MEMS

    NASA Astrophysics Data System (ADS)

    Lee, Sang-Hyun; Mitchell, Jay; Welch, Warren; Lee, Sangwoo; Najafi, Khalil

    2010-02-01

    An overview of wafer-level packaging technologies developed at the University of Michigan is presented. Two sets of packaging technologies are discussed: (i) a low temperature wafer-level packaging processes for vacuum/hermeticity sealing, and (ii) an environmentally resistant packaging (ERP) technology for thermal and mechanical control as well as vacuum packaging. The low temperature wafer-level encapsulation processes are implemented using solder bond rings which are first patterned on a cap wafer and then mated with a device wafer in order to encircle and encapsulate the device at temperatures ranging from 200 to 390 °C. Vacuum levels below 10 mTorr were achieved with yields in an optimized process of better than 90%. Pressures were monitored for more than 4 years yielding important information on reliability and process control. The ERP adopts an environment isolation platform in the packaging substrate. The isolation platform is designed to provide low power oven-control, vibration isolation and shock protection. It involves batch flip-chip assembly of a MEMS device onto the isolation platform wafer. The MEMS device and isolation structure are encapsulated at the wafer-level by another substrate with vertical feedthroughs for vacuum/hermetic sealing and electrical signal connections. This technology was developed for high performance gyroscopes, but can be applied to any type of MEMS device.

  16. A VLSI implementation of DCT using pass transistor technology

    NASA Technical Reports Server (NTRS)

    Kamath, S.; Lynn, Douglas; Whitaker, Sterling

    1992-01-01

    A VLSI design for performing the Discrete Cosine Transform (DCT) operation on image blocks of size 16 x 16 in a real time fashion operating at 34 MHz (worst case) is presented. The process used was Hewlett-Packard's CMOS26--A 3 metal CMOS process with a minimum feature size of 0.75 micron. The design is based on Multiply-Accumulate (MAC) cells which make use of a modified Booth recoding algorithm for performing multiplication. The design of these cells is straight forward, and the layouts are regular with no complex routing. Two versions of these MAC cells were designed and their layouts completed. Both versions were simulated using SPICE to estimate their performance. One version is slightly faster at the cost of larger silicon area and higher power consumption. An improvement in speed of almost 20 percent is achieved after several iterations of simulation and re-sizing.

  17. VLSI system design

    NASA Astrophysics Data System (ADS)

    Muroga, S.

    A complete picture of LSI/VLSI system design is provided, encompassing both engineering and economic considerations. The subjects discussed include: cost analysis based on production volume, yield, chip size, design manpower and other factors; bipolar and MOS logic families, logic design procedures, and mask designs; use of ROMs and PLAs in logic design, along with design algorithms; a survey of CAD used in LSI/VLSI chip design. Also covered are: full-custom and semicustom designs; microprocessor and dedicated processor chips; system design and hardware-software tradeoffs; LSI/VLSI technological trends; new products realized by LSI/VLSI technology; future production and management problems.

  18. National solar technology roadmap: Wafer-silicon PV

    SciTech Connect

    Sopori, Bhushan

    2007-06-01

    This report applies to all bulk-silicon-based PV technologies, including those based on Czochralski, multicrystalline, float-zone wafers, and melt-grown crystals that are 100 μm or thicker, such as ribbons, sheet, or spheral silicon.

  19. Product assurance technology for custom LSI/VLSI electronics

    NASA Technical Reports Server (NTRS)

    Buehler, M. G.; Blaes, B. R.; Jennings, G. A.; Moore, B. T.; Nixon, R. H.; Pina, C. A.; Sayah, H. R.; Sievers, M. W.; Stahlberg, N. F.

    1985-01-01

    The technology for obtaining custom integrated circuits from CMOS-bulk silicon foundries using a universal set of layout rules is presented. The technical efforts were guided by the requirement to develop a 3 micron CMOS test chip for the Combined Release and Radiation Effects Satellite (CRRES). This chip contains both analog and digital circuits. The development employed all the elements required to obtain custom circuits from silicon foundries, including circuit design, foundry interfacing, circuit test, and circuit qualification.

  20. Wafer-level manufacturing technology of glass microlenses

    NASA Astrophysics Data System (ADS)

    Gossner, U.; Hoeftmann, T.; Wieland, R.; Hansch, W.

    2014-08-01

    In high-tech products, there is an increasing demand to integrate glass lenses into complex micro systems. Especially in the lighting industry LEDs and laser diodes used for automotive applications require encapsulated micro lenses. To enable low-cost production, manufacturing of micro lenses on wafer level base using a replication technology is a key technology. This requires accurate forming of thousands of lenses with a diameter of 1-2 mm on a 200 mm wafer compliant with mass production. The article will discuss the technical aspects of a lens manufacturing replication process and the challenges, which need to be solved: choice of an appropriate master for replication, thermally robust interlayer coating, choice of replica glass, bonding and separation procedure. A promising approach for the master substrate material is based on a lens structured high-quality glass wafer with high melting point covered by a coating layer of amorphous silicon or germanium. This layer serves as an interlayer for the glass bonding process. Low pressure chemical vapor deposition and plasma enhanced chemical vapor deposition processes allow a deposition of layer coatings with different hydrogen and doping content influencing their chemical and physical behavior. A time reduced molding process using a float glass enables the formation of high quality lenses while preserving the recyclability of the mother substrate. The challenge is the separation of the replica from the master mold. An overview of chemical methods based on optimized etching of coating layer through small channels will be given and the impact of glass etching on surface roughness is discussed.

  1. High data rate Reed-Solomon encoding and decoding using VLSI technology

    NASA Technical Reports Server (NTRS)

    Miller, Warner; Morakis, James

    1987-01-01

    Presented as an implementation of a Reed-Solomon encode and decoder, which is 16-symbol error correcting, each symbol is 8 bits. This Reed-Solomon (RS) code is an efficient error correcting code that the National Aeronautics and Space Administration (NASA) will use in future space communications missions. A Very Large Scale Integration (VLSI) implementation of the encoder and decoder accepts data rates up 80 Mbps. A total of seven chips are needed for the decoder (four of the seven decoding chips are customized using 3-micron Complementary Metal Oxide Semiconduction (CMOS) technology) and one chip is required for the encoder. The decoder operates with the symbol clock being the system clock for the chip set. Approximately 1.65 billion Galois Field (GF) operations per second are achieved with the decoder chip set and 640 MOPS are achieved with the encoder chip.

  2. High data rate Reed-Solomon encoding and decoding using VLSI technology

    NASA Astrophysics Data System (ADS)

    Miller, Warner; Morakis, James

    Presented as an implementation of a Reed-Solomon encode and decoder, which is 16-symbol error correcting, each symbol is 8 bits. This Reed-Solomon (RS) code is an efficient error correcting code that the National Aeronautics and Space Administration (NASA) will use in future space communications missions. A Very Large Scale Integration (VLSI) implementation of the encoder and decoder accepts data rates up 80 Mbps. A total of seven chips are needed for the decoder (four of the seven decoding chips are customized using 3-micron Complementary Metal Oxide Semiconduction (CMOS) technology) and one chip is required for the encoder. The decoder operates with the symbol clock being the system clock for the chip set. Approximately 1.65 billion Galois Field (GF) operations per second are achieved with the decoder chip set and 640 MOPS are achieved with the encoder chip.

  3. Wafer-scale micro-optics replication technology

    NASA Astrophysics Data System (ADS)

    Rossi, Markus; Rudmann, Hartmut; Marty, Brigitte; Maciossek, Andreas

    2003-11-01

    For many high-volume applications of micro-optical elements and systems the most cost-effective fabrication technology is replication in polymer materials with techniques such as UV embossing, hot embossing, and injection molding. Replication significantly reduces the cost in volume production in comparison to silicon-based etched components. However, the temperature and humidity stability of most commercial polymers is not suitable for the application of replicated elements in areas such as telecom or datacom. A process based on UV-replication in chemically durable polymers has been developed. Technologies for all fabrication steps from mastering over tooling to replication on wafer-scale, post-processing and characterization are described. We present results of various projects with double-sided micro-optics for telecom/datacom and various sensor applications.

  4. A Wafer Transfer Technology for MEMS Adaptive Optics

    NASA Technical Reports Server (NTRS)

    Yang, Eui-Hyeok; Wiberg, Dean V.

    2001-01-01

    Adaptive optics systems require the combination of several advanced technologies such as precision optics, wavefront sensors, deformable mirrors, and lasers with high-speed control systems. The deformable mirror with a continuous membrane is a key component of these systems. This paper describes a new technique for transferring an entire wafer-level silicon membrane from one substrate to another. This technology is developed for the fabrication of a compact deformable mirror with a continuous facet. A 1 (mu)m thick silicon membrane, 100 mm in diameter, has been successfully transferred without using adhesives or polymers (i.e. wax, epoxy, or photoresist). Smaller or larger diameter membranes can also be transferred using this technique. The fabricated actuator membrane with an electrode gap of 1.5 (mu)m shows a vertical deflection of 0.37 (mu)m at 55 V.

  5. VLSI neuroprocessors

    NASA Technical Reports Server (NTRS)

    Kemeny, Sabrina E.

    1994-01-01

    Electronic and optoelectronic hardware implementations of highly parallel computing architectures address several ill-defined and/or computation-intensive problems not easily solved by conventional computing techniques. The concurrent processing architectures developed are derived from a variety of advanced computing paradigms including neural network models, fuzzy logic, and cellular automata. Hardware implementation technologies range from state-of-the-art digital/analog custom-VLSI to advanced optoelectronic devices such as computer-generated holograms and e-beam fabricated Dammann gratings. JPL's concurrent processing devices group has developed a broad technology base in hardware implementable parallel algorithms, low-power and high-speed VLSI designs and building block VLSI chips, leading to application-specific high-performance embeddable processors. Application areas include high throughput map-data classification using feedforward neural networks, terrain based tactical movement planner using cellular automata, resource optimization (weapon-target assignment) using a multidimensional feedback network with lateral inhibition, and classification of rocks using an inner-product scheme on thematic mapper data. In addition to addressing specific functional needs of DOD and NASA, the JPL-developed concurrent processing device technology is also being customized for a variety of commercial applications (in collaboration with industrial partners), and is being transferred to U.S. industries. This viewgraph p resentation focuses on two application-specific processors which solve the computation intensive tasks of resource allocation (weapon-target assignment) and terrain based tactical movement planning using two extremely different topologies. Resource allocation is implemented as an asynchronous analog competitive assignment architecture inspired by the Hopfield network. Hardware realization leads to a two to four order of magnitude speed-up over conventional

  6. Designing defect spins for wafer-scale quantum technologies

    SciTech Connect

    Koehl, William F.; Seo, Hosung; Galli, Giulia; Awschalom, David D.

    2015-11-27

    The past decade has seen remarkable progress in the development of the nitrogen-vacancy (NV) defect center in diamond, which is one of the leading candidates for quantum information technologies. The success of the NV center as a solid-state qubit has stimulated an active search for similar defect spins in other technologically important and mature semiconductors, such as silicon carbide. If successfully combined with the advanced microfabrication techniques available to such materials, coherent quantum control of defect spins could potentially lead to semiconductor-based, wafer-scale quantum technologies that make use of exotic quantum mechanical phenomena like entanglement. In this article, we describe the robust spin property of the NV center and the current status of NV center research for quantum information technologies. We then outline first-principles computational modeling techniques based on density functional theory to efficiently search for potential spin defects in nondiamond hosts suitable for quantum information applications. The combination of computational modeling and experimentation has proven invaluable in this area, and we describe the successful interplay between theory and experiment achieved with the divacancy spin qubit in silicon carbide.

  7. Multi-wafer bonding technology for the integration of a micromachined Mirau interferometer

    NASA Astrophysics Data System (ADS)

    Wang, Wei-Shan; Lullin, Justine; Froemel, Joerg; Wiemer, Maik; Bargiel, Sylwester; Passilly, Nicolas; Gorecki, Christophe; Gessner, Thomas

    2015-02-01

    The paper presents the multi-wafer bonding technology as well as the integration of electrical connection to the zscanner wafer of the micromachined array-type Mirau interferometer. A Mirau interferometer, which is a key-component of optical coherence tomography (OCT) microsystem, consists of a microlens doublet, a MOEMS Z-scanner, a focusadjustment spacer and a beam splitter plate. For the integration of this MOEMS device heterogeneous bonding of Si, glass and SOI wafers is necessary. Previously, most of the existing methods for multilayer wafer bonding require annealing at high temperature, i.e., 1100°C. To be compatible with MEMS devices, bonding of different material stacks at temperatures lower than 400°C has also been investigated. However, if more components are involved, it becomes less effective due to the alignment accuracy or degradation of surface quality of the not-bonded side after each bonding operation. The proposed technology focuses on 3D integration of heterogeneous building blocks, where the assembly process is compatible with the materials of each wafer stack and with position accuracy which fits optical requirement. A demonstrator with up to 5 wafers bonded lower than 400°C is presented and bond interfaces are evaluated. To avoid the complexity of through wafer vias, a design which creates electrical connections along vertical direction by mounting a wafer stack on a flip chip PCB is proposed. The approach, which adopts vertically-stacked wafers along with electrical connection functionality, provides not only a space-effective integration of MOEMS device but also a design where the Mirau stack can be further integrated with other components of the OCT microsystem easily.

  8. Fast integral rigorous modeling applied to wafer topography effect prediction on 2x nm bulk technologies

    NASA Astrophysics Data System (ADS)

    Michel, J.-C.; Le Denmat, J.-C.; Tishchenko, A.; Jourlin, Y.

    2014-03-01

    Reflection by wafer topography and underlying layers during optical lithography can cause unwanted overexposure in the resist [1]. In most cases, the use of bottom anti reflective coating limits this effect. However, this solution is not always suitable because of process complexity, cost and cycle time penalty, as for ionic implantation lithography process in 28nm bulk technology. As a consequence, computational lithography solutions are currently under development to simulate and correct wafer topographical effects [2], [3]. For ionic implantation source drain (SD) photolithography step, wafer topography influences resulting in implant pattern variation are various: active silicon areas, Poly patterns, Shallow Trench Isolation (STI) and topographical transitions between these areas. In 28nm bulk SD process step, the large number of wafer stack variations involved in implant pattern modulation implies a complex modeling of optical proximity effects. Furthermore, those topography effects are expected to increase with wafer stack complexity through technology node downscaling evolution. In this context, rigorous simulation can bring significant value for wafer topography modeling evolution in R and D process development environment. Unfortunately, classical rigorous simulation engines are rapidly run time and memory limited with pattern complexity for multiple under layer wafer topography simulation. A presentation of a fast rigorous Maxwell's equation solving algorithm integrated into a photolithography proximity effects simulation flow is detailed in this paper. Accuracy, run time and memory consumption of this fast rigorous modeling engine is presented through the simulation of wafer topography effects during ionic implantation SD lithography step in 28nm bulk technology. Also, run time and memory consumption comparison is shown between presented fast rigorous modeling and classical rigorous RCWA method through simulation of design of interest. Finally

  9. High transmittance silicon terahertz polarizer using wafer bonding technology

    NASA Astrophysics Data System (ADS)

    Yu, Ting-Yang; Tsai, Hsin-Cheng; Wang, Shiang-Yu; Luo, Chih-Wei; Chen, Kuan-Neng

    2015-08-01

    Due to the difficulties faced in fabricating robust Terahertz (THz) optical components with low Fresnel reflection loss, the need to increase the efficiency of THz system with reduced cost is still considered as one of the most essential tasks. In this report, a new low cost THz polarizer with robust structure is proposed and demonstrated. This new THz wire grid polarizer was based on an anti-reflection (AR) layer fabricated with low temperature metal bonding and deep reactive ion etching (DRIE). After patterning Cu wire gratings and the corresponding In/Sn solder ring on the individual silicon wafers, the inner gratings were sealed by wafer-level Cu to In/Sn guard ring bonding, providing the protection against humidity oxidation and corrosion. With the low eutectic melting point of In/Sn solder, wafers could be bonded face to face below 150°C. Two anti-reflection layers on both outward surfaces were fabricated by DRIE. With the mixing of empty holes and silicon, the effective refractive index was designed to be the square root of the silicon refractive index. The central frequency of the anti-reflection layers was designed between 0.5THz to 2THz with an approximate bandwidth of 0.5THz. The samples were measured with a commercial free-standing wire grid polarizer by a THz time domain spectroscopy (THz-TDS) from 0.2THz to 2.2THz. The power transmittance is close to 100% at central frequency. Extinction ratio of the polarizer is between 20dB to 40dB depending on the frequency. The advantages of this new polarizer include high transmittance, robust structure and low cost with no precision optical alignment required.

  10. Product assurance technology for procuring reliable, radiation-hard, custom LSI/VLSI electronics

    NASA Technical Reports Server (NTRS)

    Buehler, M. G.; Allen, R. A.; Blaes, B. R.; Hicks, K. A.; Jennings, G. A.; Lin, Y.-S.; Pina, C. A.; Sayah, H. R.; Zamani, N.

    1989-01-01

    Advanced measurement methods using microelectronic test chips are described. These chips are intended to be used in acquiring the data needed to qualify Application Specific Integrated Circuits (ASIC's) for space use. Efforts were focused on developing the technology for obtaining custom IC's from CMOS/bulk silicon foundries. A series of test chips were developed: a parametric test strip, a fault chip, a set of reliability chips, and the CRRES (Combined Release and Radiation Effects Satellite) chip, a test circuit for monitoring space radiation effects. The technical accomplishments of the effort include: (1) development of a fault chip that contains a set of test structures used to evaluate the density of various process-induced defects; (2) development of new test structures and testing techniques for measuring gate-oxide capacitance, gate-overlap capacitance, and propagation delay; (3) development of a set of reliability chips that are used to evaluate failure mechanisms in CMOS/bulk: interconnect and contact electromigration and time-dependent dielectric breakdown; (4) development of MOSFET parameter extraction procedures for evaluating subthreshold characteristics; (5) evaluation of test chips and test strips on the second CRRES wafer run; (6) two dedicated fabrication runs for the CRRES chip flight parts; and (7) publication of two papers: one on the split-cross bridge resistor and another on asymmetrical SRAM (static random access memory) cells for single-event upset analysis.

  11. VLSI array processor

    NASA Astrophysics Data System (ADS)

    Greenwood, E.

    1982-07-01

    The Arithmetic Processor Unit (APU) data base design check was completed. Minor design rule violations and design improvements were accomplished. The APU mask set has been fabricated and checked. Initial checking of all mask layers revealed a design rule problem in one layer. That layer was corrected, refabricated and checked out. The mask set has been delivered to the chip fabrication area. The fabrication process has been initiated. All work on the Array Processor Demonstration System (APDS) has been suspended at CHI until the additionally requested funding was received. That funding has been authorized and CHI will begin work on the APDS in July. The following activities are planned in the following quarter: 1) Complete fabrication of the first lot of VLSI APU devices. 2) Complete integration and check-out of the APDS simulator. 3) Complete integration and check-out of the APU breadboard. 4) Verify the VLSI APU wafer tests with the APU breadboard. 5) Complete check-out of the APDS using the APU breadboard.

  12. An electron-multiplying ‘Micromegas’ grid made in silicon wafer post-processing technology

    NASA Astrophysics Data System (ADS)

    Chefdeville, M.; Colas, P.; Giomataris, Y.; van der Graaf, H.; Heijne, E. H. M.; van der Putten, S.; Salm, C.; Schmitz, J.; Smits, S.; Timmermans, J.; Visschers, J. L.

    2006-01-01

    A technology for manufacturing an aluminium grid onto a silicon wafer has been developed. The grid is fixed parallel and precisely to the wafer (anode) surface at a distance of 50 μm by means of insulating pillars. When some 400 V are applied between the grid and (anode) wafer, gas multiplication occurs: primary electrons from the drift space above the grid enter the holes and cause electron avalanches in the high-field region between the grid and the anode. Production and operational characteristics of the device are described. With this newly developed technology, CMOS (pixel) readout chips can be covered with a gas multiplication grid. Such a chip forms, together with the grid, an integrated device which can be applied as readout in a wide field of gaseous detectors.

  13. Direct wafer bonding technology for large-scale InGaAs-on-insulator transistors

    SciTech Connect

    Kim, SangHyeon E-mail: sh-kim@kist.re.kr; Ikku, Yuki; Takenaka, Mitsuru; Takagi, Shinichi; Yokoyama, Masafumi; Nakane, Ryosho; Li, Jian; Kao, Yung-Chung

    2014-07-28

    Heterogeneous integration of III-V devices on Si wafers have been explored for realizing high device performance as well as merging electrical and photonic applications on the Si platform. Existing methodologies have unavoidable drawbacks such as inferior device quality or high cost in comparison with the current Si-based technology. In this paper, we present InGaAs-on-insulator (-OI) fabrication from an InGaAs layer grown on a Si donor wafer with a III-V buffer layer instead of growth on a InP donor wafer. This technology allows us to yield large wafer size scalability of III-V-OI layers up to the Si wafer size of 300 mm with a high film quality and low cost. The high film quality has been confirmed by Raman and photoluminescence spectra. In addition, the fabricated InGaAs-OI transistors exhibit the high electron mobility of 1700 cm{sup 2}/V s and uniform distribution of the leakage current, indicating high layer quality with low defect density.

  14. Heterostructurally integrated III-V semiconductors fabricated by wafer bonding technology

    NASA Astrophysics Data System (ADS)

    Shi, Fang Frank

    Integrating advanced microelectronic, photonic, and micromechanical devices, including nanoscale devices, into a three-dimensional architecture has become a key issue to realizing the advanced microintegrated systems for both electronic and biotechnological applications. Wafer bonding (wafer fusion) has been considered as one of the most promising technologies to integrate mismatched materials and devices into a chip level. One of the primary concerns of on-chip integration of mismatched micro- or nanodevices would be of material compatibility and interface structures at different length scales (including nanoscale), and the structural relations with the device electronic, optical, and mechanical performances. Accordingly, in the first section of this thesis work, the interface microstructures of wafer-bonded semiconductors, such as GaAs, InP, and GaN, have been systematically studied. The relations among the interface morphologies, chemistry, dislocation structures, and the wafer bonding processes have been determined. The electronic transport behaviors of both n-typed and p-typed majority and minority carriers at different wafer-bonded interface junctions with emphasis on the temporal correlations of electrical properties and interface microstructures from varied annealing processes have also been analyzed. Furthermore, the effects of the wafer rotation alignments on electrical characteristics of both n-n and p-n junctions have been investigated. Quantitative relations of interface conductivity of n-n junctions and ideality factor of p-n junctions at different alignment with varied annealing conditions have also been reported. Secondly, the adhesion, mechanical reliability, and wafer bondability of directly bonded GaAs, InP, and GaN semiconductors, together with their interfacial microfailure model, have also been carefully analyzed through the correlations between the wafer annealing processes, interface fracture energy and shear strength, and microfailure

  15. An aluminum-germanium eutectic structure for silicon wafer bonding technology

    NASA Astrophysics Data System (ADS)

    Perez-Quintana, I.; Ottaviani, G.; Tonini, R.; Felisari, L.; Garavaglia, M.; Oggioni, L.; Morin, D.

    2005-08-01

    An aluminum-germanium eutectic bonding technology has been used to uniformly bond two silicon wafers for MEMS packaging at temperatures as low as 450 °C, well below the aluminum-silicon eutectic temperature (577 °C). A device silicon wafer has been put in contact with a cap wafer where an aluminum film covered by a germanium film has been thermally evaporated. The annealing has been performed in a vacuum furnace under uniaxial pressure variable from 1.8 up to 30 kbar. The samples have been analyzed with various analytical techniques. 4He+ MeV Rutherford Backscattering Spectrometry (RBS) has been used to measure the thicknesses of the deposited films and to follow the aluminum-germanium intermixing, Scanning Acoustic Microscope (SAM) to control the uniformity of the bonding, Scanning Electron Microscope (SEM) associated with electron induced X-ray fluorescence to analyze composition, morphology and elements distribution in the film between the two bonded wafers. The temperatures for the annealing were selected above and below the Ge-Al the eutectic temperature. At temperatures below the eutectic no-bonding has been obtained for any applied pressure. Above the eutectic bonding occurs. The formation of a liquid film is mandatory to obtain a reproducible and robust bonding. The pressure is necessary to improve the contacts between the two wafers; its role in the metallurgy of the bonding needs to be explored.

  16. Wafer-level packaging and direct interconnection technology based on hybrid bonding and through silicon vias

    NASA Astrophysics Data System (ADS)

    Kühne, Stéphane; Hierold, Christofer

    2011-08-01

    The presented wafer-level packaging technology enables the direct integration of electrical interconnects during low-temperature wafer bonding of a cap substrate featuring through silicon vias (TSVs) onto a MEMS device wafer. The hybrid bonding process is based on hydrophilic direct bonding of plasma-activated Si/SiO2 surfaces and the simultaneous interconnection of the device metallization layers with Cu TSVs by transient liquid phase (TLP) bonding of ultra-thin AuSn connects. The direct bond enables precise geometry definition between device and cap substrate, whereas the TLP bonding does not require a planarization of the interconnect metallization before bonding. The complete process flow is successfully validated and the fabricated devices' characterization evidenced ohmic interconnects without interfacial voids in the TLP bond.

  17. A new VLSI compatible rapid thermal processing system

    NASA Astrophysics Data System (ADS)

    Aitken, D.; Mehta, S.; Parisi, N.; Russo, C. J.; Schwartz, V.

    Rapid thermal processing (RTP) is increasingly becoming a significant tool to meet the challenge of fabricating miniaturized MOS and bipolar devices. The primary advantages of RTP over conventional furnace annealing include the shorter heat cycle, well-controlled soak times at peak temperatures and the capability to rapidly change anneal ambients, thereby enhancing its flexibility as a process tool. The major applications of RTP in VLSI technology that are presently being pursued include: (i) implant-damage annealing/dopant activation, (ii) silicide formation, (iii) glass reflow, (iv) thin film growth/deposition (oxides, nitrides, oxy-nitrides) and (v) contact alloying. This paper discusses a new rapid thermal processor, RTP-800/8000, recently introduced by Varian. The discussion will include mechanical and electrical design, software, heating process compatibility, process uniformity and repeatability, process setup and noncontact temperature measurement. The heating system consists of a tungsten lamp array surrounded by a highly reflective mirror system designed to provide good temperature uniformity for wafer sizes up to 200 mm. The RTP-8000 has a serial cassette-to-cassette automatic wafer handling system. The RTP-800 possesses a single wafer, operator-assisted wafer handling system. The RTP-800/8000 has an automated multiple gas flow control and also has the optional capability of processing wafers in vacuum. An infrared optical pyrometer measures the wafer temperature from the backside of the wafer. In the RTP-8000, touch screen operation of the menu-driven recipes is easy with user-friendly software. A separate electroluminescent flat panel display provides information for maintenance and servicing and reports the system status. Process information is provided on this display in the RTP-800.

  18. Self-adaptive phosphor coating technology for wafer-level scale chip packaging

    NASA Astrophysics Data System (ADS)

    Linsong, Zhou; Haibo, Rao; Wei, Wang; Xianlong, Wan; Junyuan, Liao; Xuemei, Wang; Da, Zhou; Qiaolin, Lei

    2013-05-01

    A new self-adaptive phosphor coating technology has been successfully developed, which adopted a slurry method combined with a self-exposure process. A phosphor suspension in the water-soluble photoresist was applied and exposed to LED blue light itself and developed to form a conformal phosphor coating with self-adaptability to the angular distribution of intensity of blue light and better-performing spatial color uniformity. The self-adaptive phosphor coating technology had been successfully adopted in the wafer surface to realize a wafer-level scale phosphor conformal coating. The first-stage experiments show satisfying results and give an adequate demonstration of the flexibility of self-adaptive coating technology on application of WLSCP.

  19. Diamond MEMS: wafer scale processing, devices, and technology insertion

    NASA Astrophysics Data System (ADS)

    Carlisle, J. A.

    2009-05-01

    Diamond has long held the promise of revolutionary new devices: impervious chemical barriers, smooth and reliable microscopic machines, and tough mechanical tools. Yet it's been an outsider. Laboratories have been effectively growing diamond crystals for at least 25 years, but the jump to market viability has always been blocked by the expense of diamond production and inability to integrate with other materials. Advances in chemical vapor deposition (CVD) processes have given rise to a hierarchy of carbon films ranging from diamond-like carbon (DLC) to vapor-deposited diamond coatings, however. All have pros and cons based on structure and cost, but they all share some of diamond's heralded attributes. The best performer, in theory, is the purest form of diamond film possible, one absent of graphitic phases. Such a material would capture the extreme hardness, high Young's modulus and chemical inertness of natural diamond. Advanced Diamond Technologies Inc., Romeoville, Ill., is the first company to develop a distinct chemical process to create a marketable phase-pure diamond film. The material, called UNCD® (for ultrananocrystalline diamond), features grain sizes from 3 to 300 nm in size, and layers just 1 to 2 microns thick. With significant advantages over other thin films, UNCD is designed to be inexpensive enough for use in atomic force microscopy (AFM) probes, microelectromechanical machines (MEMS), cell phone circuitry, radio frequency devices, and even biosensors.

  20. A novel fabrication technology for anti-reflex wafer-level vacuum packaged microscanning mirrors

    NASA Astrophysics Data System (ADS)

    Oldsen, M.; Hofmann, U.; Quenzer, H. J.; Janes, J.; Stolte, C.; Gruber, K.; Ites, M.; Sörensen, F.; Wagner, B.

    2008-02-01

    The use of microscanning mirrors in mobile laser projection systems demands for robust fabrication technologies. Dust, change in humidity and temperature can only be tolerated if the fragile devices are enclosed in a hermetic package. A novel fabrication process is presented based on two 30 micron thick epitaxially deposited silicon layers and a buried interconnection layer. This technology allows the fabrication of stacked combdrives for electrostatic mirror actuation and lateral feedthroughs needed for hermetic encapsulation with standard wafer bonding processes. High display resolution requires large scan angles of the mirror plate. Therefore, a fabrication technology for structured glass wafers is presented to provide deep cavities for large mirror plate movements. A solution for effective laser spot reflex suppression is presented based on a static tilt of the mirror plate in relation to the glass cover wafer during eutectic bonding. By doing so, the reflex generated at the glass surfaces is shifted out of the image area. The cavity pressure of packaged devices has been measured showing the necessity of a getter layer in order to provide cavity pressures below 1 mbar. The performance of a packaged device with integrated getter layer has been evaluated. A driving amplitude of only 6 V is needed to achieve scan angles of above 50 deg. White light interferometric measurements showed excellent planarity of the mirror plate with a radius of curvature of about 18 m.

  1. VLSI research

    NASA Astrophysics Data System (ADS)

    Brodersen, R. W.

    1984-04-01

    A scaled version of the RISC II chip has been fabricated and tested and these new chips have a cycle time that would outperform a VAX 11/780 by about a factor of two on compiled integer C programs. The architectural work on a RISC chip designed for a Smalltalk implementation has been completed. This chip, called SOAR (Smalltalk On a RISC), should run program s4-15 times faster than the Xerox 1100 (Dolphin), a TTL minicomputer, and about as fast as the Xerox 1132 (Dorado), a $100,000 ECL minicomputer. The 1983 VLSI tools tape has been converted for use under the latest UNIX release (4.2). The Magic (formerly called Caddy) layout system will be a unified set of highly automated tools that cover all aspects of the layout process, including stretching, compaction, tiling and routing. A multiple window package and design rule checker for this system have just been completed and compaction and stretching are partially implemented. New slope-based timing models for the Crystal timing analyzer are now fully implemented and in regular use. In an accuracy test using a dozen critical paths from the RISC II processor and cache chips it was found that Crystal's estimates were within 5-10% of SPICE's estimates, while being a factor of 10,000 times faster.

  2. Wafer topography modeling for ionic implantation mask correction dedicated to 2x nm FDSOI technologies

    NASA Astrophysics Data System (ADS)

    Michel, Jean-Christophe; Le Denmat, Jean-Christophe; Sungauer, Elodie; Robert, Frédéric; Yesilada, Emek; Armeanu, Ana-Maria; Entradas, Jorge; Sturtevant, John L.; Do, Thuy; Granik, Yuri

    2013-04-01

    Reflection by wafer topography and underlying layers during optical lithography can cause unwanted exposure in the resist [1]. This wafer stack effect phenomenon which is neglected for larger nodes than 45nm, is becoming problematic for 32nm technology node and below at the ionic implantation process. This phenomenon is expected to be attenuated by the use of anti-reflecting coating but increases process complexity and adds cost and cycle time penalty. As a consequence, an OPC based solution is today under evaluation to cope with stack effects involved in ionic implantation patterning [2] [3]. For the source drain (SD) ionic implantation process step on 28nm Fully Depleted Silicon-on-Insulator (FDSOI) technology, active silicon areas, poly silicon patterns, Shallow Trench Isolation (STI), Silicon-on-Insulator (SOI) areas and the transitions between these different regions result in significant SD implant pattern critical dimension variations. The large number of stack variations involved in these effects implies a complex modeling to simulate pattern degradations. This paper deals with the characterization of stack effects on 28nm node using SOI substrates. The large number of measurements allows to highlight all individual and combined stack effects. A new modeling flow has been developed in order to generate wafer stack aware OPC model. The accuracy and the prediction of the model is presented in this paper.

  3. Interactions of double patterning technology with wafer processing, OPC and design flows

    NASA Astrophysics Data System (ADS)

    Lucas, Kevin; Cork, Chris; Miloslavsky, Alex; Luk-Pat, Gerry; Barnes, Levi; Hapli, John; Lewellen, John; Rollins, Greg; Wiaux, Vincent; Verhaegen, Staf

    2008-03-01

    Double patterning technology (DPT) is one of the main options for printing logic devices with half-pitch less than 45nm; and flash and DRAM memory devices with half-pitch less than 40nm. DPT methods decompose the original design intent into two individual masking layers which are each patterned using single exposures and existing 193nm lithography tools. The results of the individual patterning layers combine to re-create the design intent pattern on the wafer. In this paper we study interactions of DPT with lithography, masks synthesis and physical design flows. Double exposure and etch patterning steps create complexity for both process and design flows. DPT decomposition is a critical software step which will be performed in physical design and also in mask synthesis. Decomposition includes cutting (splitting) of original design intent polygons into multiple polygons where required; and coloring of the resulting polygons. We evaluate the ability to meet key physical design goals such as: reduce circuit area; minimize rework; ensure DPT compliance; guarantee patterning robustness on individual layer targets; ensure symmetric wafer results; and create uniform wafer density for the individual patterning layers.

  4. Customizable VLSI artificial neural network chips based on a novel technology

    SciTech Connect

    Fu, C. Y.; Law, B.; Chapline, G.; Swenson, D.

    1993-09-14

    The human cerebral cortex contains approximately 10{sup 11} neurons and 10{sup 14} synapses. It thus seems logical that any technology intended to mimic human capabilities should have the ability to fabricate a very large number of neurons and even larger numbers of synapses. This paper describes an implementation of hardware neural networks using highly linear thin-film resistor technology and an 8-bit binary weight circuit to produce customizable artificial neural network chips and systems.

  5. A novel technology for fabricating customizable VLSI artificial neural network chips

    SciTech Connect

    Fu, C.Y.; Law, B.; Chapline, G.; Swenson, D.

    1992-02-05

    This paper describes an implementation of hardware neural networks using highly linear thin-film resistor technology and an 8-bit binary weight circuit to produce customizable artificial neural network chips and systems. These neural networks are programmed using precision laser cutting and deposition. The fast turnaround of laser-based customization allows us to explore different neural network architectures and to rapidly program the synaptic weights. Our customizable chip allows us to expand an artificial network laterally and vertically. This flexibility permits us to build very large neural network systems.

  6. Sensitivity analysis of add-on price estimate for select silicon wafering technologies

    NASA Technical Reports Server (NTRS)

    Mokashi, A. R.

    1982-01-01

    The cost of producing wafers from silicon ingots is a major component of the add-on price of silicon sheet. Economic analyses of the add-on price estimates and their sensitivity internal-diameter (ID) sawing, multiblade slurry (MBS) sawing and fixed-abrasive slicing technique (FAST) are presented. Interim price estimation guidelines (IPEG) are used for estimating a process add-on price. Sensitivity analysis of price is performed with respect to cost parameters such as equipment, space, direct labor, materials (blade life) and utilities, and the production parameters such as slicing rate, slices per centimeter and process yield, using a computer program specifically developed to do sensitivity analysis with IPEG. The results aid in identifying the important cost parameters and assist in deciding the direction of technology development efforts.

  7. Thin-film encapsulation technology for above-IC MEMS wafer-level packaging

    NASA Astrophysics Data System (ADS)

    Zhang, Qing; Cicek, Paul-Vahé; Nabki, Frederic; El-Gamal, Mourad

    2013-12-01

    This work presents a low-cost and low-temperature wafer-level packaging solution for microelectromechanical systems (MEMS) devices. Heat-sensitive polymer poly(propylene carbonate) is used as the sacrificial material to release the capping layer in a clean and fast manner. Free-standing caps made of amorphous silicon carbide films and as large as 450 µm in diameter are successfully fabricated. To demonstrate the validity of this technology, surface-micromachined Pirani vacuum gauges are fabricated as an example of MEMS devices and encapsulated. Capped Pirani gauges respond to pressure between 1 mTorr and 1 atm. The Pirani gauges are sealed with Parylene C films that exhibit near-hermetic properties and the initial sealing pressure for 300 µm diameter cavities is characterized to be in the range of tens of torr.

  8. VLSI Universal Noiseless Coder

    NASA Technical Reports Server (NTRS)

    Rice, Robert F.; Lee, Jun-Ji; Fang, Wai-Chi

    1989-01-01

    Proposed universal noiseless coder (UNC) compresses stream of data signals for efficient transmission in channel of limited bandwidth. Noiseless in sense original data completely recoverable from output code. System built as very-large-scale integrated (VLSI) circuit, compressing data in real time at input rates as high as 24 Mb/s, and possibly faster, depending on specific design. Approach yields small, lightweight system operating reliably and consuming little power. Constructed as single, compact, low-power VLSI circuit chip. Design of VLSI circuit chip made specific to code algorithms. Entire UNC fabricated in single chip, worst-case power dissipation less than 1 W.

  9. Novel wafer track-based resolution enhancement technology for 248-nm DUV lithography

    NASA Astrophysics Data System (ADS)

    Zhong, Tom X.; Gurer, Emir; Lewellen, John W.; Lee, Ed C.

    2000-06-01

    248 nm DUV lithography has become a mainstream production technology for sub-0.25 micrometer feature sizes due to its superior process technology and improved cost of ownership (COO). As the semiconductor industry moves to sub-0.18 micron critical layer feature sizes, there is an enormous economic incentive to extend 248 nm technology towards smaller geometries. Traditionally, resolution enhancement technologies such as various illumination types (off-axis, annular ring and quadrapole) and phase shifted masks are based on the optimization of the diffracted aerial image wave front and they concentrate on the exposure tools and masks. In this paper we report a new novel resolution enhancement technology based on the wafer track. We have demonstrated that this new technology, along with the scanner-based resolution enhancement techniques, can substantially improve resolution capabilities and process latitudes of the 248 nm technology. Consequently, semiconductor manufacturers will be able to extend 248 nm DUV technology for smaller feature sizes than was possible before. Our new resolution enhancement technology allowed us to increase the contrast of an acetal-based DUV resist from about 5 to 13 by carefully controlling the environment during the post exposure bake process. This technology provided a continuous contrast knob that could be controlled and set based on the application. Increased photoresist contrast in turn made it possible to pattern 0.15 micrometer isolated lines and 0.2 micrometer dense lines using a 248 nm mercury lamp-based scanner with projection optics designed for 0.35 micrometer features. A DOF of 0.8 micrometer for 0.25 micrometer dense lines was achieved using this PEB- based resolution enhancement technology whereas conventional technology could not resolve 0.25 micrometer dense lines at all. Detailed lithographic characterization identified a 30% improvement in process latitude. Furthermore, cross sectional SEM studies revealed high quality

  10. 300 mm InGaAs-on-insulator substrates fabricated using direct wafer bonding and the Smart Cut™ technology

    NASA Astrophysics Data System (ADS)

    Widiez, Julie; Sollier, Sébastien; Baron, Thierry; Martin, Mickaël; Gaudin, Gweltaz; Mazen, Frédéric; Madeira, Florence; Favier, Sylvie; Salaun, Amélie; Alcotte, Reynald; Beche, Elodie; Grampeix, Helen; Veytizou, Christelle; Moulet, Jean-Sébastien

    2016-04-01

    This paper reports the first demonstration of 300 mm In0.53Ga0.47As-on-insulator (InGaAs-OI) substrates. The use of direct wafer bonding and the Smart Cut™ technology lead to the transfer of high quality InGaAs layer on large Si wafer size (300 mm) at low effective cost, taking into account the reclaim of the III-V on Si donor substrate. The optimization of the three key building blocks of this technology is detailed. (1) The III-V epitaxial growth on 300 mm Si wafers has been optimized to decrease the defect density. (2) For the first time, hydrogen-induced thermal splitting is made inside the indium phosphide (InP) epitaxial layer and a wide implantation condition ranges is observed on the contrary to bulk InP. (3) Finally a specific direct wafer bonding with alumina oxide has been chosen to avoid outgas diffusion at the alumina oxide/III-V compound interface.

  11. Image processing via VLSI: A concept paper

    NASA Technical Reports Server (NTRS)

    Nathan, R.

    1982-01-01

    Implementing specific image processing algorithms via very large scale integrated systems offers a potent solution to the problem of handling high data rates. Two algorithms stand out as being particularly critical -- geometric map transformation and filtering or correlation. These two functions form the basis for data calibration, registration and mosaicking. VLSI presents itself as an inexpensive ancillary function to be added to almost any general purpose computer and if the geometry and filter algorithms are implemented in VLSI, the processing rate bottleneck would be significantly relieved. A set of image processing functions that limit present systems to deal with future throughput needs, translates these functions to algorithms, implements via VLSI technology and interfaces the hardware to a general purpose digital computer is developed.

  12. Yield-driven multi-project reticle design and wafer dicing

    NASA Astrophysics Data System (ADS)

    Kahng, Andrew B.; Mandoiu, Ion; Xu, Xu; Zelikovsky, Alex

    2005-11-01

    The aggressive scaling of VLSI feature size and the pervasive use of advanced reticle enhancement technologies has lead to dramatic increases in mask costs, pushing prototype and low volume production designs at the limit of economic feasibility. Multiple project wafers (MPW), or "shuttle" runs, provide an attractive solution for such low volume designs, by providing a mechanism to share the cost of mask tooling among up to tens of designs. However, MPW reticle design and wafer dicing introduce complexities not encountered in typical, single-project wafers. Recent works on wafer dicing adopt some assumptions to reduce the problem complexity. Although using one or more assumptions makes the problem solvable, the feasibility or performance of the solutions may be degraded. Also, the delay cost associated with schedule alignment was ignored in all previous works. In this paper we propose a general MPW flow including four main steps: (1) schedule-aware project partitioning (2) multi-project reticle floorplanning, (3) wafer shot-map definition, and (4) wafer dicing plan definition. Our project partitioner provides the best trade-off between the mask cost and delay cost. Our reticle floorplaner can automatically clone a design to better fit given production volumes. The round wafer shot-map definition step allows extracting functional dies from partially printed reticle images. Finally, our dicing planner allows multiple side-to-side dicing plans for different wafers and image rows/columns within a wafer. Experiments on industry testcases show that our methods outperform significantly not only previous methods in the literature, but also reticle floorplans manually designed by experienced engineers.

  13. Process Control By Automated In-Process Wafer Inspection

    NASA Astrophysics Data System (ADS)

    Harris, K. L.; Sandland, P.; Singleton, R. M.

    1984-06-01

    This is the introduction of new technology developed specifically for the inprocess pattern inspection and measurement of very large scale integrated (VLSI) wafers. There is a current need for significant improvements in pattern inspection instrumentation in order to tighten process control and achieve more competitive yields and therefore die costs. For the tedious and detailed task of pattern inspection and measurement, automation is the indicated solution. The future of computerized manufacturing requires, most fundamentally, the automation of the instrumentation and control function. In this paper, a system, designated the KLA 2020 Wafer Inspector, is described which incorporates the basic functions required to measure variations in the patterning process: linear and area dimensional measurements, registration error measurement, comparison for defects down to submicron in size. It is capable of inspecting in-process wafers in order to gain the most immediate process feedback. The speed with which it does each of these tests, less than a second, allows significant increases in sample size and therefore statistical control. It is this technology which will make computer-controlled photo processing possible.

  14. Wafer bonding technology for new generation vacuum MEMS: challenges and promises

    NASA Astrophysics Data System (ADS)

    Dragoi, V.; Pabo, E.

    2015-05-01

    Various MEMS devices are incorporated into consumer electronic devices. A particular category of MEMS require vacuum packaging by wafer bonding with the need to encapsulate vacuum levels of 10-2 mbar or higher with long time stability. The vacuum requirement is limiting the choice of the wafer bonding process and raises significant challenges to the existing investigation methods (metrology) used for results qualification. From the broad range of wafer bonding processes only few are compatible with vacuum applications: fusion bonding, anodic bonding, glass frit bonding and metal-based bonding. The outgassing from the enclosed surfaces after bonding will affect the vacuum level in the cavity: in some cases, a getter material is used inside the device cavity to compensate for this outgassing. Additionally the selected bonding process must be compatible with the devices on the wafers being bonded. This work reviews the principles of vacuum encapsulation using wafer bonding. Examples showing the suitability of each process for specific applications types will be presented. A significant challenge in vacuum MEMS fabrication is the lack of analytical methods needed for process characterization or reliability testing. A short overview of the most used methods and their limitations will be presented. Specific needs to be addressed will be introduced with examples.

  15. Supercomputing with VLSI

    SciTech Connect

    Manohar, S.

    1989-01-01

    Supercoprocessors (SCPs), highly parallel VLSI architectures tuned to solving a specific problem class, are shown to provide a means of cost-effective supercomputing. A methodology for building SCPs for different computation-intensive problems is described: two pragmatic constraints namely problem-size-independence and limited-bandwidth constraint are imposed on special-purposes architectures; a simple but powerful model of computation is used to derive general upper bounds on the speedup obtainable using such architectures. It is shown that bounds established by other authors for matrix multiplication and sorting, using problem-specific approaches, can be derived very simply using this model. Poisson Engine-I (PE-I), a prototype SCP, is a system for solving the Laplace equation using the finite difference approximation. PE-I uses a novel approach: asynchronous iteration methods are implemented using a fixed-size, synchronous array of simple processing elements. Architectural and algorithmic extensions to PE-I are briefly considered: the solution of a wider class of PDEs and the use of more sophisticated algorithms like the multigrid method are some of the issues addressed. The SCP methodology is applied to the problems of matrix-multiplication and sorting. For sorting, an SCP with superlinear speedup is outlined. For the matrix problem, the architecture and implementation details of SMP are described in detail. SMP, realized with about fifty chips using current technology, is capable of through-puts greater than 150 Mflops, and is also unique in being optimal with respect to the lowerbound derived using the SCP model. The use of a collection of sup SCPs is advanced as a cost-effective supercomputing alternative.

  16. The 1992 4th NASA SERC Symposium on VLSI Design

    NASA Technical Reports Server (NTRS)

    Whitaker, Sterling R.

    1992-01-01

    Papers from the fourth annual NASA Symposium on VLSI Design, co-sponsored by the IEEE, are presented. Each year this symposium is organized by the NASA Space Engineering Research Center (SERC) at the University of Idaho and is held in conjunction with a quarterly meeting of the NASA Data System Technology Working Group (DSTWG). One task of the DSTWG is to develop new electronic technologies that will meet next generation electronic data system needs. The symposium provides insights into developments in VLSI and digital systems which can be used to increase data systems performance. The NASA SERC is proud to offer, at its fourth symposium on VLSI design, presentations by an outstanding set of individuals from national laboratories, the electronics industry, and universities. These speakers share insights into next generation advances that will serve as a basis for future VLSI design.

  17. NASA Space Engineering Research Center for VLSI System Design

    NASA Technical Reports Server (NTRS)

    1993-01-01

    This annual report outlines the activities of the past year at the NASA SERC on VLSI Design. Highlights for this year include the following: a significant breakthrough was achieved in utilizing commercial IC foundries for producing flight electronics; the first two flight qualified chips were designed, fabricated, and tested and are now being delivered into NASA flight systems; and a new technology transfer mechanism has been established to transfer VLSI advances into NASA and commercial systems.

  18. VLSI in biomedical imaging systems.

    PubMed

    Sridhar, R; Jones, T

    1995-01-01

    This paper explores the nature of Very Large Scale Integration (VLSI) systems as applied to the area of medical imaging systems. A general discussion of imaging systems and the techniques employed therein will be presented. With this, the merits of VLSI solutions to the medical imaging problem are presented. Consideration is also given to programmable processors, such as off the shelf DSP processors, semi-custom, and full custom VLSI devices. Through the use of VLSI devices, many image processing algorithms can be integrated into a hardware solution. This has the advantage of increased computational capacity over solutions that would normally employ software techniques. PMID:7736415

  19. Verification of VLSI designs

    NASA Technical Reports Server (NTRS)

    Windley, P. J.

    1991-01-01

    In this paper we explore the specification and verification of VLSI designs. The paper focuses on abstract specification and verification of functionality using mathematical logic as opposed to low-level boolean equivalence verification such as that done using BDD's and Model Checking. Specification and verification, sometimes called formal methods, is one tool for increasing computer dependability in the face of an exponentially increasing testing effort.

  20. VLSI Reed-Solomon Encoder

    NASA Technical Reports Server (NTRS)

    Liu, K. Y.

    1983-01-01

    Modular Reed-solomon encoder uses identical custom VLSI chips called "symbol slices." By cascading and properly interconnecting group of these chips, encoder is made for any desired error-correcting capability and interleaving level. VLSI encoder requires only one-tenth the number of chips required by conventional Reed-Solomon Circuit implemented with discrete IC's.

  1. Very Large Scale Integration (VLSI).

    ERIC Educational Resources Information Center

    Yeaman, Andrew R. J.

    Very Large Scale Integration (VLSI), the state-of-the-art production techniques for computer chips, promises such powerful, inexpensive computing that, in the future, people will be able to communicate with computer devices in natural language or even speech. However, before full-scale VLSI implementation can occur, certain salient factors must be…

  2. Reliable VLSI sequential controllers

    NASA Technical Reports Server (NTRS)

    Whitaker, S.; Maki, G.; Shamanna, M.

    1990-01-01

    A VLSI architecture for synchronous sequential controllers is presented that has attractive qualities for producing reliable circuits. In these circuits, one hardware implementation can realize any flow table with a maximum of 2(exp n) internal states and m inputs. Also all design equations are identical. A real time fault detection means is presented along with a strategy for verifying the correctness of the checking hardware. This self check feature can be employed with no increase in hardware. The architecture can be modified to achieve fail safe designs. With no increase in hardware, an adaptable circuit can be realized that allows replacement of faulty transitions with fault free transitions.

  3. High-Throughput Multiple Dies-to-Wafer Bonding Technology and III/V-on-Si Hybrid Lasers for Heterogeneous Integration of Optoelectronic Integrated Circuits

    NASA Astrophysics Data System (ADS)

    Luo, Xianshu; Cao, Yulian; Song, Junfeng; Hu, Xiaonan; Cheng, Yungbing; Li, Chengming; Liu, Chongyang; Liow, Tsung-Yang; Yu, Mingbin; Wang, Hong; Wang, Qijie; Lo, Patrick Guo-Qiang

    2015-04-01

    Integrated optical light source on silicon is one of the key building blocks for optical interconnect technology. Great research efforts have been devoting worldwide to explore various approaches to integrate optical light source onto the silicon substrate. The achievements so far include the successful demonstration of III/V-on-Si hybrid lasers through III/V-gain material to silicon wafer bonding technology. However, for potential large-scale integration, leveraging on mature silicon complementary metal oxide semiconductor (CMOS) fabrication technology and infrastructure, more effective bonding scheme with high bonding yield is in great demand considering manufacturing needs. In this paper, we propose and demonstrate a high-throughput multiple dies-to-wafer (D2W) bonding technology which is then applied for the demonstration of hybrid silicon lasers. By temporarily bonding III/V dies to a handle silicon wafer for simultaneous batch processing, it is expected to bond unlimited III/V dies to silicon device wafer with high yield. As proof-of-concept, more than 100 III/V dies bonding to 200 mm silicon wafer is demonstrated. The high performance of the bonding interface is examined with various characterization techniques. Repeatable demonstrations of 16-III/V-die bonding to pre-patterned 200 mm silicon wafers have been performed for various hybrid silicon lasers, in which device library including Fabry-Perot (FP) laser, lateral-coupled distributed feedback (LC-DFB) laser with side wall grating, and mode-locked laser (MLL). From these results, the presented multiple D2W bonding technology can be a key enabler towards the large-scale heterogeneous integration of optoelectronic integrated circuits (H-OEIC).

  4. Low-Cost High-Efficiency Solar Cells with Wafer Bonding and Plasmonic Technologies

    NASA Astrophysics Data System (ADS)

    Tanake, Katsuaki

    We fabricated a direct-bond interconnected multijunction solar cell, a two-terminal monolithic GaAs/InGaAs dual-junction cell, to demonstrate a proof-of-principle for the viability of direct wafer bonding for solar cell applications. The bonded interface is a metal-free n+GaAs/n +InP tunnel junction with highly conductive Ohmic contact suitable for solar cell applications overcoming the 4% lattice mismatch. The quantum efficiency spectrum for the bonded cell was quite similar to that for each of unbonded GaAs and InGaAs subcells. The bonded dual-junction cell open-circuit voltage was equal to the sum of the unbonded subcell open-circuit voltages, which indicates that the bonding process does not degrade the cell material quality since any generated crystal defects that act as recombination centers would reduce the open-circuit voltage. Also, the bonded interface has no significant carrier recombination rate to reduce the open circuit voltage. Engineered substrates consisting of thin films of InP on Si handle substrates (InP/Si substrates or epitaxial templates) have the potential to significantly reduce the cost and weight of compound semiconductor solar cells relative to those fabricated on bulk InP substrates. InGaAs solar cells on InP have superior performance to Ge cells at photon energies greater than 0.7 eV and the current record efficiency cell for 1 sun illumination was achieved using an InGaP/GaAs/InGaAs triple junction cell design with an InGaAs bottom cell. Thermophotovoltaic (TPV) cells from the InGaAsP-family of III-V materials grown epitaxially on InP substrates would also benefit from such an InP/Si substrate. Additionally, a proposed four-junction solar cell fabricated by joining subcells of InGaAs and InGaAsP grown on InP with subcells of GaAs and AlInGaP grown on GaAs through a wafer-bonded interconnect would enable the independent selection of the subcell band gaps from well developed materials grown on lattice matched substrates. Substitution of

  5. Mixed voltage VLSI design

    NASA Technical Reports Server (NTRS)

    Panwar, Ramesh; Rennels, David; Alkalaj, Leon

    1993-01-01

    A technique for minimizing the power dissipated in a Very Large Scale Integration (VLSI) chip by lowering the operating voltage without any significant penalty in the chip throughput even though low voltage operation results in slower circuits. Since the overall throughput of a VLSI chip depends on the speed of the critical path(s) in the chip, it may be possible to sustain the throughput rates attained at higher voltages by operating the circuits in the critical path(s) with a high voltage while operating the other circuits with a lower voltage to minimize the power dissipation. The interface between the gates which operate at different voltages is crucial for low power dissipation since the interface may possibly have high static current dissipation thus negating the gains of the low voltage operation. The design of a voltage level translator which does the interface between the low voltage and high voltage circuits without any significant static dissipation is presented. Then, the results of the mixed voltage design using a greedy algorithm on three chips for various operating voltages are presented.

  6. VLSI Architectures for Computing DFT's

    NASA Technical Reports Server (NTRS)

    Truong, T. K.; Chang, J. J.; Hsu, I. S.; Reed, I. S.; Pei, D. Y.

    1986-01-01

    Simplifications result from use of residue Fermat number systems. System of finite arithmetic over residue Fermat number systems enables calculation of discrete Fourier transform (DFT) of series of complex numbers with reduced number of multiplications. Computer architectures based on approach suitable for design of very-large-scale integrated (VLSI) circuits for computing DFT's. General approach not limited to DFT's; Applicable to decoding of error-correcting codes and other transform calculations. System readily implemented in VLSI.

  7. Neural Networks Of VLSI Components

    NASA Technical Reports Server (NTRS)

    Eberhardt, Silvio P.

    1991-01-01

    Concept for design of electronic neural network calls for assembly of very-large-scale integrated (VLSI) circuits of few standard types. Each VLSI chip, which contains both analog and digital circuitry, used in modular or "building-block" fashion by interconnecting it in any of variety of ways with other chips. Feedforward neural network in typical situation operates under control of host computer and receives inputs from, and sends outputs to, other equipment.

  8. Enabling more capability within smaller pixels: advanced wafer-level process technologies for integration of focal plane arrays with readout electronics

    NASA Astrophysics Data System (ADS)

    Temple, Dorota S.; Vick, Erik P.; Lueck, Matthew R.; Malta, Dean; Skokan, Mark R.; Masterjohn, Christopher M.; Muzilla, Mark S.

    2014-05-01

    Over the past decade, the development of infrared focal plane arrays (FPAs) has seen two trends: decreasing of the pixel size and increasing of signal-processing capability at the device level. Enabling more capability within smaller pixels can be achieved through the use of advanced wafer-level processes for the integration of FPAs with silicon (Si) readout integrated circuits (ROICs). In this paper, we review the development of these wafer-level integration technologies, highlighting approaches in which the infrared sensor is integrated with three-dimensional ROIC stacks composed of multiple layers of Si circuitry interconnected using metal-filled through-silicon vias.

  9. Launching of multi-project wafer runs in ePIXfab with micron-scale silicon rib waveguide technology

    NASA Astrophysics Data System (ADS)

    Aalto, Timo; Cherchi, Matteo; Harjanne, Mikko; Ylinen, Sami; Kapulainen, Markku; Vehmas, Tapani

    2014-03-01

    Silicon photonics is a rapidly growing R&D field where universities, institutes and companies are all involved and the business expectations for the next few years are high. One of the key enabling elements that led to the present success of silicon photonics is ePIXfab. It is a consortium of institutes that has together offered multi-project wafer (MPW) runs, packaging services, training, and feasibility studies. These services have significantly lowered the barrier of various research groups and companies to start developing silicon photonics. Until now the MPW services have been offered by the ePIXfab partners IMEC, CEA-Leti and IHP, which all use CMOS-type silicon photonics technology with a typical silicon-on-insulator (SOI) waveguide thickness of 220 nm. In November 2013 this MPW offering was expanded by the ePIXfab partner VTT that opened the access to its 3 μm SOI waveguide platform via ePIXfab MPW runs. This technology platform is complementary to the mainstream silicon photonics technology (220 nm) and it offers such benefits as very low losses, small polarization dependency, ultrabroadband operation and low starting costs

  10. VLSI MIL-STD-1750A processor development

    NASA Astrophysics Data System (ADS)

    Gaertner, M.; Winter, T.; Brauchmann, W.

    An American company is developing a VLSI program to design, fabricate, characterize, and deliver a family of General Purpose Computers optimized to execute MIL-STD-1750A Notice 1. The CPU architecture is fashioned in an extensible functional module configuration with a performance range from 0.9 MIPS to 1.5 MIPS (DAIS-type Mix). The three configurations which have emerged include baseline CPU, baseline CPU plus floating point accelerator, and 32-bit data path CPU (ISA Invisible). It is pointed out that these machines will employ multisource VLSI low power CMOS technology and will be fully qualified to meet military environmental specifications.

  11. Database approach to communication in VLSI design

    NASA Astrophysics Data System (ADS)

    Wiederhold, G.; Beetem, A.; Short, G.

    1980-10-01

    This paper describes recent and planned work at Stanford in applying database technology to the problems of VLSI design. In particular, it addresses the issue of communication within a design's different representations and hierarchical levels in a multiple designer environment. We demonstrate the heretofore questioned utility of using commercial database systems, at least while developing a versatile, flexible, and generally efficient model and its associated communication paths. Completed work and results from initial work using DEC DBMS 20 is presented, including macro expansion within the database, and signalling of changes to higher structural levels. Considerable discussion regarding overall philosophy for continued work is also included.

  12. Synaptic dynamics in analog VLSI.

    PubMed

    Bartolozzi, Chiara; Indiveri, Giacomo

    2007-10-01

    Synapses are crucial elements for computation and information transfer in both real and artificial neural systems. Recent experimental findings and theoretical models of pulse-based neural networks suggest that synaptic dynamics can play a crucial role for learning neural codes and encoding spatiotemporal spike patterns. Within the context of hardware implementations of pulse-based neural networks, several analog VLSI circuits modeling synaptic functionality have been proposed. We present an overview of previously proposed circuits and describe a novel analog VLSI synaptic circuit suitable for integration in large VLSI spike-based neural systems. The circuit proposed is based on a computational model that fits the real postsynaptic currents with exponentials. We present experimental data showing how the circuit exhibits realistic dynamics and show how it can be connected to additional modules for implementing a wide range of synaptic properties. PMID:17716003

  13. VLSI Reed-Solomon decoder

    NASA Astrophysics Data System (ADS)

    Kim, Yong H.; Chung, Young Mo; Lee, Sang Uk

    1992-11-01

    In this paper, a VLSI architecture for Reed-Solomon (RS) decoder based on the Berlekamp algorithm is proposed. The proposed decoder provides both erasure and error correcting capability. In order to reduce the chip area, we reformulate the Berlekamp algorithm. The proposed algorithm possesses a recursive structure so that the number of cells for computing the errata locator polynomial can be reduced. Moreover, in our approach, only one finite field multiplication per clock cycle is required for implementation, provided an improvement in the decoding speed. And the overall architecture features parallel and pipelined structure, making a real time decoding possible. It is shown that the proposed VLSI architecture is more efficient in terms of VLSI implementation than the architecture based on the recursive Euclid algorithm.

  14. 3D integration approaches for MEMS and CMOS sensors based on a Cu through-silicon-via technology and wafer level bonding

    NASA Astrophysics Data System (ADS)

    Hofmann, L.; Dempwolf, S.; Reuter, D.; Ecke, R.; Gottfried, K.; Schulz, S. E.; Knechtel, R.; Geßner, T.

    2015-05-01

    Technologies for the 3D integration are described within this paper with respect to devices that have to retain a specific minimum wafer thickness for handling purposes (CMOS) and integrity of mechanical elements (MEMS). This implies Through-Silicon Vias (TSVs) with large dimensions and high aspect ratios (HAR). Moreover, as a main objective, the aspired TSV technology had to be universal and scalable with the designated utilization in a MEMS/CMOS foundry. Two TSV approaches are investigated and discussed, in which the TSVs were fabricated either before or after wafer thinning. One distinctive feature is an incomplete TSV Cu-filling, which avoids long processing and complex process control, while minimizing the thermomechanical stress between Cu and Si and related adverse effects in the device. However, the incomplete filling also includes various challenges regarding process integration. A method based on pattern plating is described, in which TSVs are metalized at the same time as the redistribution layer and which eliminates the need for additional planarization and patterning steps. For MEMS, the realization of a protective hermetically sealed capping is crucial, which is addressed in this paper by glass frit wafer level bonding and is discussed for hermetic sealing of MEMS inertial sensors. The TSV based 3D integration technologies are demonstrated on CMOS like test vehicle and on a MEMS device fabricated in Air Gap Insulated Microstructure (AIM) technology.

  15. Machining lead wafers

    SciTech Connect

    Schamaun, R.T.

    1987-09-01

    Recently, MEC-6 machined some 4-inch-diameter lead wafers to precision tolerances. The tolerance on the wafer thickness was +-0.000080 inch. A diamond tool was used to machine the wafers on a Moore No. 3 lathe. This report discusses the methods used to machine the wafers, the fixtures used to hold the wafers, and the inspection methods and results.

  16. Recursive computer architecture for VLSI

    SciTech Connect

    Treleaven, P.C.; Hopkins, R.P.

    1982-01-01

    A general-purpose computer architecture based on the concept of recursion and suitable for VLSI computer systems built from replicated (lego-like) computing elements is presented. The recursive computer architecture is defined by presenting a program organisation, a machine organisation and an experimental machine implementation oriented to VLSI. The experimental implementation is being restricted to simple, identical microcomputers each containing a memory, a processor and a communications capability. This future generation of lego-like computer systems are termed fifth generation computers by the Japanese. 30 references.

  17. GaAs VLSI for aerospace electronics

    NASA Technical Reports Server (NTRS)

    Larue, G.; Chan, P.

    1990-01-01

    Advanced aerospace electronics systems require high-speed, low-power, radiation-hard, digital components for signal processing, control, and communication applications. GaAs VLSI devices provide a number of advantages over silicon devices including higher carrier velocities, ability to integrate with high performance optical devices, and high-resistivity substrates that provide very short gate delays, good isolation, and tolerance to many forms of radiation. However, III-V technologies also have disadvantages, such as lower yield compared to silicon MOS technology. Achieving very large scale integration (VLSI) is particularly important for fast complex systems. At very short gate delays (less than 100 ps), chip-to-chip interconnects severely degrade circuit clock rates. Complex systems, therefore, benefit greatly when as many gates as possible are placed on a single chip. To fully exploit the advantages of GaAs circuits, attention must be focused on achieving high integration levels by reducing power dissipation, reducing the number of devices per logic function, and providing circuit designs that are more tolerant to process and environmental variations. In addition, adequate noise margin must be maintained to ensure a practical yield.

  18. Laser wafering for silicon solar.

    SciTech Connect

    Friedmann, Thomas Aquinas; Sweatt, William C.; Jared, Bradley Howell

    2011-03-01

    Current technology cuts solar Si wafers by a wire saw process, resulting in 50% 'kerf' loss when machining silicon from a boule or brick into a wafer. We want to develop a kerf-free laser wafering technology that promises to eliminate such wasteful wire saw processes and achieve up to a ten-fold decrease in the g/W{sub p} (grams/peak watt) polysilicon usage from the starting polysilicon material. Compared to today's technology, this will also reduce costs ({approx}20%), embodied energy, and green-house gas GHG emissions ({approx}50%). We will use short pulse laser illumination sharply focused by a solid immersion lens to produce subsurface damage in silicon such that wafers can be mechanically cleaved from a boule or brick. For this concept to succeed, we will need to develop optics, lasers, cleaving, and high throughput processing technologies capable of producing wafers with thicknesses < 50 {micro}m with high throughput (< 10 sec./wafer). Wafer thickness scaling is the 'Moore's Law' of silicon solar. Our concept will allow solar manufacturers to skip entire generations of scaling and achieve grid parity with commercial electricity rates. Yet, this idea is largely untested and a simple demonstration is needed to provide credibility for a larger scale research and development program. The purpose of this project is to lay the groundwork to demonstrate the feasibility of laser wafering. First, to design and procure on optic train suitable for producing subsurface damage in silicon with the required damage and stress profile to promote lateral cleavage of silicon. Second, to use an existing laser to produce subsurface damage in silicon, and third, to characterize the damage using scanning electron microscopy and confocal Raman spectroscopy mapping.

  19. VLSI mixed signal processing system

    NASA Technical Reports Server (NTRS)

    Alvarez, A.; Premkumar, A. B.

    1993-01-01

    An economical and efficient VLSI implementation of a mixed signal processing system (MSP) is presented in this paper. The MSP concept is investigated and the functional blocks of the proposed MSP are described. The requirements of each of the blocks are discussed in detail. A sample application using active acoustic cancellation technique is described to demonstrate the power of the MSP approach.

  20. Fundamentals of Microelectronics Processing (VLSI).

    ERIC Educational Resources Information Center

    Takoudis, Christos G.

    1987-01-01

    Describes a 15-week course in the fundamentals of microelectronics processing in chemical engineering, which emphasizes the use of very large scale integration (VLSI). Provides a listing of the topics covered in the course outline, along with a sample of some of the final projects done by students. (TW)

  1. An efficient interpolation filter VLSI architecture for HEVC standard

    NASA Astrophysics Data System (ADS)

    Zhou, Wei; Zhou, Xin; Lian, Xiaocong; Liu, Zhenyu; Liu, Xiaoxiang

    2015-12-01

    The next-generation video coding standard of High-Efficiency Video Coding (HEVC) is especially efficient for coding high-resolution video such as 8K-ultra-high-definition (UHD) video. Fractional motion estimation in HEVC presents a significant challenge in clock latency and area cost as it consumes more than 40 % of the total encoding time and thus results in high computational complexity. With aims at supporting 8K-UHD video applications, an efficient interpolation filter VLSI architecture for HEVC is proposed in this paper. Firstly, a new interpolation filter algorithm based on the 8-pixel interpolation unit is proposed in this paper. It can save 19.7 % processing time on average with acceptable coding quality degradation. Based on the proposed algorithm, an efficient interpolation filter VLSI architecture, composed of a reused data path of interpolation, an efficient memory organization, and a reconfigurable pipeline interpolation filter engine, is presented to reduce the implement hardware area and achieve high throughput. The final VLSI implementation only requires 37.2k gates in a standard 90-nm CMOS technology at an operating frequency of 240 MHz. The proposed architecture can be reused for either half-pixel interpolation or quarter-pixel interpolation, which can reduce the area cost for about 131,040 bits RAM. The processing latency of our proposed VLSI architecture can support the real-time processing of 4:2:0 format 7680 × 4320@78fps video sequences.

  2. SEMICONDUCTOR TECHNOLOGY A new cleaning process for the metallic contaminants on a post-CMP wafer's surface

    NASA Astrophysics Data System (ADS)

    Baohong, Gao; Yuling, Liu; Chenwei, Wang; Yadong, Zhu; Shengli, Wang; Qiang, Zhou; Baimei, Tan

    2010-10-01

    This paper presents a new cleaning process using boron-doped diamond (BDD) film anode electrochemical oxidation for metallic contaminants on polished silicon wafer surfaces. The BDD film anode electrochemical oxidation can efficiently prepare pyrophosphate peroxide, pyrophosphate peroxide can oxidize organic contaminants, and pyrophosphate peroxide is deoxidized into pyrophosphate. Pyrophosphate, a good complexing agent, can form a metal complex, which is a structure consisting of a copper ion, bonded to a surrounding array of two pyrophosphate anions. Three polished wafers were immersed in the 0.01 mol/L CuSO4 solution for 2 h in order to make comparative experiments. The first one was cleaned by pyrophosphate peroxide, the second by RCA (Radio Corporation of America) cleaning, and the third by deionized (DI) water. The XPS measurement result shows that the metallic contaminants on wafers cleaned by the RCA method and by pyrophosphate peroxide is less than the XPS detection limits of 1 ppm. And the wafer's surface cleaned by pyrophosphate peroxide is more efficient in removing organic carbon residues than RCA cleaning. Therefore, BDD film anode electrochemical oxidation can be used for microelectronics cleaning, and it can effectively remove organic contaminants and metallic contaminants in one step. It also achieves energy saving and environmental protection.

  3. Novel spin-coating technology for 248-nm/193-nm DUV lithography and low-k spin on dielectrics of 200-mm/300-mm wafers

    NASA Astrophysics Data System (ADS)

    Gurer, Emir; Zhong, Tom X.; Lewellen, John W.; Lee, Ed C.

    2000-06-01

    An alternative coating technology was developed for 248 nm/193 nm DUV lithography and low-k spin on dielectric (SOD) materials used in the interconnect area. This is a 300 mm enabling technology which overcomes turbulent flow limitations above 2000 rpm and it prevents 40 - 60% reduction on the process latitudes of evaporation-related variables, common to 300 mm conventional coaters. Our new coating technology is fully enclosed and it is capable of controlling the solvent concentration above the resist film dynamically in the gas phase. This feature allows a direct control of the evaporation mass transfer which determines the quality of the final resist profiles. Following process advantages are reported in this paper: (1) Demonstrated that final resist film thickness can be routinely varied by 4000 angstrom at a fixed drying spin speed, thus minimizing the impact of turbulence wall for 300 mm wafers. (2) Evaporation control allows wider range of useful thickness from a fixed viscosity material. (3) Latitudes of evaporation-related process variables is about 40% larger than that of a conventional coater. (4) Highly uniform films of 0.05% were obtained for 8800 angstrom target thickness with tighter wafer-wafer profile control because of the enclosed nature of the technology. (5) Dynamic evaporation control facilitates resist consumption minimization. Preliminary results indicate feasibility of a 0.4 cc process of record (POR) for a 200 mm substrate. (6) Lower COO due to demonstrated relative insensitivity to environmental variables, robust resist consumption minimization and superior process capabilities. (7) Improved planarization and gap fill properties for the new generation photoresist/low-k SOD materials deposited using this enclosed coating technology.

  4. The Fifth NASA Symposium on VLSI Design

    NASA Technical Reports Server (NTRS)

    1993-01-01

    The fifth annual NASA Symposium on VLSI Design had 13 sessions including Radiation Effects, Architectures, Mixed Signal, Design Techniques, Fault Testing, Synthesis, Signal Processing, and other Featured Presentations. The symposium provides insights into developments in VLSI and digital systems which can be used to increase data systems performance. The presentations share insights into next generation advances that will serve as a basis for future VLSI design.

  5. VLSI Reed Solomon decoder design

    NASA Technical Reports Server (NTRS)

    Maki, Gary K.; Owsley, Patrick A.; Cameron, Kelly B.; Venbrux, Jack

    1986-01-01

    A Reed Solomon code is a highly efficient error correcting code that NASA will use in future space communication missions. A VLSI implementation of the decoder is presented that accepts data rates of 80 Mbits/second. A total of seven chips are needed and operate with the symbol clock being the system clock for the chip set. Approximately 1.65 billion Galois Field operations per second are achieved with this chip set.

  6. Mumford and Shah functional: VLSI analysis and implementation.

    PubMed

    Martina, Maurizio; Masera, Guido

    2006-03-01

    This paper describes the analysis of the Mumford and Shah functional from the implementation point of view. Our goal is to show results in terms of complexity for real-time applications, such as motion estimation based on segmentation techniques, of the Mumford and Shah functional. Moreover, the sensitivity to finite precision representation is addressed, a fast VLSI architecture is described, and results obtained for its complete implementation on a 0.13 microm standard cells technology are presented. PMID:16526435

  7. Improved self arbitrated VLSI asynchronous circuits

    NASA Technical Reports Server (NTRS)

    Winterrowd, P.

    1991-01-01

    This paper introduces an improved method for designing the class of CMOS VLSI asynchronous sequential circuits introduced in the paper by Sterling R. Whitaker and Gary K. Maki, 'Self Arbitrated VLSI Asynchronous Circuits.' Of main interest here is the simple design by inspection rules that arise from these circuits. This paper presents a variation on these circuits which reduces the number of transistors required.

  8. CCSDS Reed Solomon VLSI chip set

    NASA Technical Reports Server (NTRS)

    Cameron, K.; Whitaker, S.; Liu, N.; Liu, K.; Canaris, J.

    1990-01-01

    A highly efficient error correcting code has been selected by NASA as a CCSDS standard: the 16 symbol error correcting Reed Solomon code. A VLSI implementation of this decoder is described in this paper. A total of 4 full custom VLSI chips are needed that correct data in real time at an sustained rate of up to 80 Mbits/second.

  9. Systolic VLSI for Kalman filters

    NASA Technical Reports Server (NTRS)

    Yeh, H.-G.; Chang, J. J.

    1986-01-01

    A novel two-dimensional parallel computing method for real-time Kalman filtering is presented. The mathematical formulation of a Kalman filter algorithm is rearranged to be the type of Faddeev algorithm for generalizing signal processing. The data flow mapping from the Faddeev algorithm to a two-dimensional concurrent computing structure is developed. The architecture of the resulting processor cells is regular, simple, expandable, and therefore naturally suitable for VLSI chip implementation. The computing methodology and the two-dimensional systolic arrays are useful for Kalman filter applications as well as other matrix/vector based algebraic computations.

  10. VLSI Processor For Vector Quantization

    NASA Technical Reports Server (NTRS)

    Tawel, Raoul

    1995-01-01

    Pixel intensities in each kernel compared simultaneously with all code vectors. Prototype high-performance, low-power, very-large-scale integrated (VLSI) circuit designed to perform compression of image data by vector-quantization method. Contains relatively simple analog computational cells operating on direct or buffered outputs of photodetectors grouped into blocks in imaging array, yielding vector-quantization code word for each such block in sequence. Scheme exploits parallel-processing nature of vector-quantization architecture, with consequent increase in speed.

  11. Fast and area-efficient VLSI adders

    SciTech Connect

    Han, T.D.

    1987-01-01

    Area-time tradeoffs have been an important topic in VLSI research. This is because the cost of fabricating a circuit is an exponential function of its area. As a result, optimizing the area of a VLSI design is much more important than optimizing the speed of an algorithm. This dissertation examines area-time tradeoffs in VLSI for prefix computation using graph representations of the problem. Since the problem is intimately related to binary addition, results obtained lead to design of area-time efficient VLSI adders. This is a major goal of the work: to design very low latency-addition circuitry that is also area-efficient. To this end, a new graph representation is presented for prefix computation that leads to the design of a fast, area-efficient binary adder. The new graph is a combination of previously known graph representations for prefix computation, and its area is close to known lower bounds on the VLSI area of parallel prefix graphs. Using it, the author designed VLSI adders having area A = O(n log n) whose delay time is the lowest possible value, i.e., the fastest possible area-efficient VLSI adder. For the large number of inputs, the pipelined model of prefix circuit is presented. Also presented is a fault-tolerant model for the developed prefix circuit, based on the partitioning of the network.

  12. Using Ant Colony Optimization for Routing in VLSI Chips

    NASA Astrophysics Data System (ADS)

    Arora, Tamanna; Moses, Melanie

    2009-04-01

    Rapid advances in VLSI technology have increased the number of transistors that fit on a single chip to about two billion. A frequent problem in the design of such high performance and high density VLSI layouts is that of routing wires that connect such large numbers of components. Most wire-routing problems are computationally hard. The quality of any routing algorithm is judged by the extent to which it satisfies routing constraints and design objectives. Some of the broader design objectives include minimizing total routed wire length, and minimizing total capacitance induced in the chip, both of which serve to minimize power consumed by the chip. Ant Colony Optimization algorithms (ACO) provide a multi-agent framework for combinatorial optimization by combining memory, stochastic decision and strategies of collective and distributed learning by ant-like agents. This paper applies ACO to the NP-hard problem of finding optimal routes for interconnect routing on VLSI chips. The constraints on interconnect routing are used by ants as heuristics which guide their search process. We found that ACO algorithms were able to successfully incorporate multiple constraints and route interconnects on suite of benchmark chips. On an average, the algorithm routed with total wire length 5.5% less than other established routing algorithms.

  13. Fully-depleted silicon-on-sapphire and its application to advanced VLSI design

    NASA Technical Reports Server (NTRS)

    Offord, Bruce W.

    1992-01-01

    In addition to the widely recognized advantages of full dielectric isolation, e.g., reduced parasitic capacitance, transient radiation hardness, and processing simplicity, fully-depleted silicon-on-sapphire offers reduced floating body effects and improved thermal characteristics when compared to other silicon-on-insulator technologies. The properties of this technology and its potential impact on advanced VLSI circuitry will be discussed.

  14. Reconfigurable VLSI architecture for a database processor

    SciTech Connect

    Oflazer, K.

    1983-01-01

    This work brings together the processing potential offered by regularly structured VLSI processing units and the architecture of a database processor-the relational associative processor (RAP). The main motivations are to integrate a RAP cell processor on a few VLSI chips and improve performance by employing procedures exploiting these VLSI chips and the system level reconfigurability of processing resources. The resulting VLSI database processor consists of parallel processing cells that can be reconfigured into a large processor to execute the hard operations of projection and semijoin efficiently. It is shown that such a configuration can provide 2 to 3 orders of magnitude of performance improvement over previous implementations of the RAP system in the execution of such operations. 27 refs.

  15. A second generation 50 Mbps VLSI level zero processing system prototype

    NASA Technical Reports Server (NTRS)

    Harris, Jonathan C.; Shi, Jeff; Speciale, Nick; Bennett, Toby

    1994-01-01

    Level Zero Processing (LZP) generally refers to telemetry data processing functions performed at ground facilities to remove all communication artifacts from instrument data. These functions typically include frame synchronization, error detection and correction, packet reassembly and sorting, playback reversal, merging, time-ordering, overlap deletion, and production of annotated data sets. The Data Systems Technologies Division (DSTD) at Goddard Space Flight Center (GSFC) has been developing high-performance Very Large Scale Integration Level Zero Processing Systems (VLSI LZPS) since 1989. The first VLSI LZPS prototype demonstrated 20 Megabits per second (Mbp's) capability in 1992. With a new generation of high-density Application-specific Integrated Circuits (ASIC) and a Mass Storage System (MSS) based on the High-performance Parallel Peripheral Interface (HiPPI), a second prototype has been built that achieves full 50 Mbp's performance. This paper describes the second generation LZPS prototype based upon VLSI technologies.

  16. A coherent VLSI design environment

    NASA Astrophysics Data System (ADS)

    Penfield, P., Jr.; Glasser, L. A.; Knight, T. F., Jr.; Leiserson, C. E.; Rivest, R. L.

    1985-09-01

    The research discussed here is described in more detail in several published and unpublished reports cited. The CAD frame Schema has progressed to the point where it is useful for ample chip designs. The interface to CIF is complete, and work has begun on importing layout libraries. An interface to EDIF is being installed. Simulators can now be connected, and thought is going into organization of VLSI libraries. A plan for the distribution of Schema is now being worked out. Previous results on waveform bounding have been generalized to large classes of problems described in canonical control-theory form. Work has begun on models for interconnect taking account of line inductance. This domain is less general than RLC networks, and there is hope that some of the previously derived bounds still apply. During this period a novel device, the UV write-enabled PROM, was reported at a conference. Work continues on developing useful circuits employing this device.

  17. Wafer capping of MEMS with fab-friendly metals

    NASA Astrophysics Data System (ADS)

    Martin, Jack

    2007-01-01

    Inertial MEMS (Micro Electro Mechanical System) sensors are normally sealed in hermetic enclosures. Some are assembled in hermetic packages but wafer level packaging has become much more important in recent years. Anodic bonding can be used to achieve wafer level seals between silicon and glass but most suppliers of inertial sensors screen print glass frit onto silicon cap wafers. After removing the organic vehicle, these patterned cap wafers are sealed to device wafer prior to wafer singulation and plastic packaging. Anodic and glass frit bonding are both cost-effective. However, they impose size, quality and performance limitations. Wafer level sealing with a metal removes some of these limitations but introduces other concerns. This paper will review the current wafer level hermetic processes followed by a description of a thermocompression metal seal technology that is compatible with IC fabrication.

  18. VLSI circuits and systems for microphotonic applications

    NASA Astrophysics Data System (ADS)

    Lachowicz, S.; Rassau, A.; Kim, C.; Lee, S.-M.

    2005-12-01

    This paper describes various VLSI systems for microphotonic applications. The first project investigates an optimum phase design implementing a multi phase Opto-ULSI processor for multi-function capable optical networks. This research is oriented around the initial development of an 8 phase Opto-ULSI processor that implements a Beam Steering (BS) Opto-ULSI processor (OUP) for integrated intelligent photonic system (IIPS), while investigating the optimal phase characteristics and developing compensation for the nonlinearity of liquid crystal. The second part provides an insight into realisation of a novel 3-D configurable chip based on "sea-of-pixels" architecture, which is highly suitable for applications in multimedia systems as well as for computation of coefficients for generation of holograms required in optical switches. The paper explores strategies for implementation of distributed primitives for arithmetic processing. This entails optimisation of basic cells that would allow using these primitives as part of a 3-D "sea-of-pixel" configurable processing array. The concept of 3-D Soft-Chip Technology (SCT) entails integration of "Soft-Processing Circuits" with "Soft-Configurable Circuits", which effectively manipulates hardware primitives through vertical integration of control and data. Thus the notion of 3-D Soft-Chip emerges as a new design paradigm for content-rich multimedia, telecommunication and photonic-based networking system applications. Combined with the effective manipulation of configurable hardware arithmetic primitives, highly efficient and powerful soft configurable processing systems can be realized.

  19. Three wafer stacking for 3D integration.

    SciTech Connect

    Greth, K. Douglas; Ford, Christine L.; Lantz, Jeffrey W.; Shinde, Subhash L.; Timon, Robert P.; Bauer, Todd M.; Hetherington, Dale Laird; Sanchez, Carlos Anthony

    2011-11-01

    Vertical wafer stacking will enable a wide variety of new system architectures by enabling the integration of dissimilar technologies in one small form factor package. With this LDRD, we explored the combination of processes and integration techniques required to achieve stacking of three or more layers. The specific topics that we investigated include design and layout of a reticle set for use as a process development vehicle, through silicon via formation, bonding media, wafer thinning, dielectric deposition for via isolation on the wafer backside, and pad formation.

  20. Constant fan-in digital neural networks are VLSI-optimal

    SciTech Connect

    Beiu, V.

    1995-12-31

    The paper presents a theoretical proof revealing an intrinsic limitation of digital VLSI technology: its inability to cope with highly connected structures (e.g. neural networks). We are in fact able to prove that efficient digital VLSI implementations (known as VLSI-optimal when minimizing the AT{sup 2} complexity measure - A being the area of the chip, and T the delay for propagating the inputs to the outputs) of neural networks are achieved for small-constant fan-in gates. This result builds on quite recent ones dealing with a very close estimate of the area of neural networks when implemented by threshold gates, but it is also valid for classical Boolean gates. Limitations and open questions are presented in the conclusions.

  1. Cost-Effective Silicon Wafers for Solar Cells: Direct Wafer Enabling Terawatt Photovoltaics

    SciTech Connect

    2010-01-15

    Broad Funding Opportunity Announcement Project: 1366 is developing a process to reduce the cost of solar electricity by up to 50% by 2020—from $0.15 per kilowatt hour to less than $0.07. 1366’s process avoids the costly step of slicing a large block of silicon crystal into wafers, which turns half the silicon to dust. Instead, the company is producing thin wafers directly from molten silicon at industry-standard sizes, and with efficiencies that compare favorably with today’s state-of-the-art technologies. 1366’s wafers could directly replace wafers currently on the market, so there would be no interruptions to the delivery of these products to market. As a result of 1366’s technology, the cost of silicon wafers could be reduced by 80%.

  2. Adhesive wafer bonding for MEMS applications

    NASA Astrophysics Data System (ADS)

    Dragoi, Viorel; Glinsner, Thomas; Mittendorfer, Gerald; Wieder, Bernhard; Lindner, Paul

    2003-04-01

    Low temperature wafer bonding is a powerful technique for MEMS/MOEMS devices fabrication and packaging. Among the low temperature processes adhesive bonding focuses a high technological interest. Adhesive wafer bonding is a bonding approach using an intermediate layer for bonding (e.g. glass, polymers, resists, polyimides). The main advantages of this method are: surface planarization, encapsulation of structures on the wafer surface, particle compensation and decrease of annealing temperature after bonding. This paper presents results on adhesive bonding using spin-on glass and Benzocyclobutene (BCB) from Dow Chemicals. The advantages of using adhesive bonding for MEMS applications will be illustrated be presenting a technology of fabricating GaAs-on-Si substrates (up to 150 mm diameter) and results on BCB bonding of Si wafers (200 mm diameter).

  3. VLSI implementations of threshold logic-a comprehensive survey.

    PubMed

    Beiu, V; Quintana, J M; Avedillo, M J

    2003-01-01

    This paper is an in-depth review on silicon implementations of threshold logic gates that covers several decades. In this paper, we will mention early MOS threshold logic solutions and detail numerous very-large-scale integration (VLSI) implementations including capacitive (switched capacitor and floating gate with their variations), conductance/current (pseudo-nMOS and output-wired-inverters, including a plethora of solutions evolved from them), as well as many differential solutions. At the end, we will briefly mention other implementations, e.g., based on negative resistance devices and on single electron technologies. PMID:18244573

  4. The 1991 3rd NASA Symposium on VLSI Design

    NASA Technical Reports Server (NTRS)

    Maki, Gary K.

    1991-01-01

    Papers from the symposium are presented from the following sessions: (1) featured presentations 1; (2) very large scale integration (VLSI) circuit design; (3) VLSI architecture 1; (4) featured presentations 2; (5) neural networks; (6) VLSI architectures 2; (7) featured presentations 3; (8) verification 1; (9) analog design; (10) verification 2; (11) design innovations 1; (12) asynchronous design; and (13) design innovations 2.

  5. Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography

    NASA Astrophysics Data System (ADS)

    Tsushima, Hiroaki; Katsuumi, Hisakazu; Ikeda, Hiroyuki; Asayama, Takeshi; Kumazaki, Takahito; Kurosu, Akihiko; Ohta, Takeshi; Kakizaki, Kouji; Matsunaga, Takashi; Mizoguchi, Hakaru

    2014-04-01

    193nm ArF excimer lasers are widely used as light sources for the lithography process of semiconductor production. 193nm ArF exicmer lasers are expected to continue to be the main solution in photolithography, since advanced lithography technologies such as multiple patterning and Self-Aligned Double Patterning (SADP) are being developed. In order to apply these technologies to high-volume semiconductor manufacturing, the key is to reduce the total operating cost. To reduce the total operating cost, life extension of consumable part and reduction of power consumption are an important factor. The chamber life time and power consumption are a main factor to decide the total operating cost. Therefore, we have developed the new technology for extension of the chamber life time and low electricity consumption. In this paper, we will report the new technology to extend the life time of the laser chamber and to reduce the electricity consumption.

  6. The VLSI design of an error-trellis syndrome decoder for certain convolutional codes

    NASA Technical Reports Server (NTRS)

    Reed, I. S.; Jensen, J. M.; Hsu, I.-S.; Truong, T. K.

    1986-01-01

    A recursive algorithm using the error-trellis decoding technique is developed to decode convolutional codes (CCs). An example, illustrating the very large scale integration (VLSI) architecture of such a decode, is given for a dual-K CC. It is demonstrated that such a decoder can be realized readily on a single chip with metal-nitride-oxide-semiconductor technology.

  7. The VLSI design of error-trellis syndrome decoding for convolutional codes

    NASA Technical Reports Server (NTRS)

    Reed, I. S.; Jensen, J. M.; Truong, T. K.; Hsu, I. S.

    1985-01-01

    A recursive algorithm using the error-trellis decoding technique is developed to decode convolutional codes (CCs). An example, illustrating the very large scale integration (VLSI) architecture of such a decode, is given for a dual-K CC. It is demonstrated that such a decoder can be realized readily on a single chip with metal-nitride-oxide-semiconductor technology.

  8. VLSI Implementation Of The Fast Fourier Transform

    NASA Astrophysics Data System (ADS)

    Chau, Paul M.; Ku, Walter H.

    1986-03-01

    A VLSI implementation of a Fast Fourier Transform (FFT) processor consisting of a mesh interconnection of complex floating-point butterfly units is presented. The Cooley-Tukey radix-2 Decimation-In-Frequency (DIF) formulation of the FFT was chosen since it offered the best overall compromise between the need for fast and efficient algorithmic computation and the need for a structure amenable to VLSI layout. Thus the VLSI implementation is modular, regular, expandable to various problem sizes and has a simple systolic flow of data and control. To evaluate the FFT architecture, VLSI area-time complexity concepts are used, but are now adapted to a complex floating-point number system rather than the usual integer ring representation. We show by our construction that the Thompson area-time optimum bound for the VLSI computation of an N-point FFT, area-time2oc = ORNlogN)1+a] can be attained by an alternative number representation, and hence the theoretical bound is a tight bound regardless of number system representation.

  9. A VLSI design concept for parallel iterative algorithms

    NASA Astrophysics Data System (ADS)

    Sun, C. C.; Götze, J.

    2009-05-01

    Modern VLSI manufacturing technology has kept shrinking down to the nanoscale level with a very fast trend. Integration with the advanced nano-technology now makes it possible to realize advanced parallel iterative algorithms directly which was almost impossible 10 years ago. In this paper, we want to discuss the influences of evolving VLSI technologies for iterative algorithms and present design strategies from an algorithmic and architectural point of view. Implementing an iterative algorithm on a multiprocessor array, there is a trade-off between the performance/complexity of processors and the load/throughput of interconnects. This is due to the behavior of iterative algorithms. For example, we could simplify the parallel implementation of the iterative algorithm (i.e., processor elements of the multiprocessor array) in any way as long as the convergence is guaranteed. However, the modification of the algorithm (processors) usually increases the number of required iterations which also means that the switch activity of interconnects is increasing. As an example we show that a 25×25 full Jacobi EVD array could be realized into one single FPGA device with the simplified μ-rotation CORDIC architecture.

  10. Interconnection capacitance models for VLSI circuits

    NASA Astrophysics Data System (ADS)

    Wong, Shyh-Chyi; Liu, Patrick S.; Ru, Jien-Wen; Lin, Shi-Tron

    1998-06-01

    A new set of capacitance models is developed for delay estimation of VLSI interconnections. The set of models is derived for five representative wiring structures, with their combinations covering arbitrary VLSI layouts. A semi-empirical approach is adopted to deal with complicated geometry nature in VLSI and to allow for closed-form capacitance formulas to be developed to provide direct observation of capacitance variation vs process parameters as well as computational efficiency for circuit simulation. The formulas are given explicitly in terms of wire width, wire thickness, dielectric thickness and inter-wire spacing. The models show good agreement with numerical solutions from RAPHAEL and measurement data of fabricated capacitance test structures. The models are further applied and validated on a ring oscillator. It is shown that the frequency of the ring oscillator obtained from HSPICE simulation with our models agrees well with the bench measurement.

  11. Ultrafast nanoelectromechanical switches for VLSI power management

    NASA Astrophysics Data System (ADS)

    Venumbaka, Sri Ramya

    Power consumption is a major concern in the present chip design industry. Complementary Metal Oxide Semiconductor (CMOS) technology scaling has led to an exponential increase in the leakage power. The excessive power dissipation can result in more heat generation, which in turn increases the temperature. According to Intel's source, power density increased to a value of 1000 W/cm2 and is approaching the value which is equal to the radiation from the sun's surface (10000 W/cm2). This leads to reliability issues in nanometer-scale CMOS as Silicon starts melting at 1687K. To resolve this issue, we introduce a novel architecture to design nanoelectromechanical switches and implementation results with virtually zero leakage current, ˜1 V operation voltage, ˜1 GHz resonant frequency and nanometer-scale footprint. Microelectromechanical Switches (MEMS) have very low "on" and very high "off" resistances. Their switching voltages are usually high (5-50 V), switching speeds are usually low (1 MHz) and their footprints tend to be very large (many um2). We have designed and fabricated devices with very low actuation voltages and very high speed using tuning fork geometry compatible with conventional CMOS fabrication technologies. This unique switch geometry decreases the actuation voltage by a factor of 1.4 and doubles the switching speed. It consists of a cantilever beam that acts as a ground plane. Upon actuation, both the ground plane and the switch's main beam move towards each other that makes the center of mass stationary during switching and thus, the switching speed doubles. These tuning fork nanoelectromechanical switches can be readily implemented in Very Large Scale Integration (VLSI) circuits to manage leakage power. The thesis will describe the Nanoelectromechanical systems (NEMS) structures, their characteristics, leakage reduction techniques, reliability of the devices and piezo actuator structures to determine contact resistance and longevity of switches.

  12. Associative Pattern Recognition In Analog VLSI Circuits

    NASA Technical Reports Server (NTRS)

    Tawel, Raoul

    1995-01-01

    Winner-take-all circuit selects best-match stored pattern. Prototype cascadable very-large-scale integrated (VLSI) circuit chips built and tested to demonstrate concept of electronic associative pattern recognition. Based on low-power, sub-threshold analog complementary oxide/semiconductor (CMOS) VLSI circuitry, each chip can store 128 sets (vectors) of 16 analog values (vector components), vectors representing known patterns as diverse as spectra, histograms, graphs, or brightnesses of pixels in images. Chips exploit parallel nature of vector quantization architecture to implement highly parallel processing in relatively simple computational cells. Through collective action, cells classify input pattern in fraction of microsecond while consuming power of few microwatts.

  13. Scriber for silicon wafers

    NASA Technical Reports Server (NTRS)

    Yamakawa, K. A.; Fortier, E. P. (Inventor)

    1981-01-01

    A device for dividing silicon wafers into rectangular chips is characterized by a base including a horizontally oriented bed with a planar support surface, a vacuum chuck adapted to capture a silicon wafer seated on the support for translation in mutually perpendicular directions. A stylus support mounted on the bed includes a shaft disposed above and extended across the bed and a truck mounted on the shaft and supported thereby for linear translation along a path extended across the bed a vertically oriented scribe has a diamond tip supported by the truck also adapted as to engage a silicon wafer captured by the chuck and positioned beneath it in order to form score lines in the surface of the wafer as linear translation is imparted to the truck. A chuck positioning means is mounted on the base and is connected to the chuck for positioning the chuck relative to the stylus.

  14. Wafer characteristics via reflectometry

    DOEpatents

    Sopori, Bhushan L.

    2010-10-19

    Various exemplary methods (800, 900, 1000, 1100) are directed to determining wafer thickness and/or wafer surface characteristics. An exemplary method (900) includes measuring reflectance of a wafer and comparing the measured reflectance to a calculated reflectance or a reflectance stored in a database. Another exemplary method (800) includes positioning a wafer on a reflecting support to extend a reflectance range. An exemplary device (200) has an input (210), analysis modules (222-228) and optionally a database (230). Various exemplary reflectometer chambers (1300, 1400) include radiation sources positioned at a first altitudinal angle (1308, 1408) and at a second altitudinal angle (1312, 1412). An exemplary method includes selecting radiation sources positioned at various altitudinal angles. An exemplary element (1650, 1850) includes a first aperture (1654, 1854) and a second aperture (1658, 1858) that can transmit reflected radiation to a fiber and an imager, respectfully.

  15. Analog VLSI-based modeling of the primate oculomotor system.

    PubMed

    Horiuchi, T K; Koch, C

    1999-01-01

    One way to understand a neurobiological system is by building a simulacrum that replicates its behavior in real time using similar constraints. Analog very large-scale integrated (VLSI) electronic circuit technology provides such an enabling technology. We here describe a neuromorphic system that is part of a long-term effort to understand the primate oculomotor system. It requires both fast sensory processing and fast motor control to interact with the world. A one-dimensional hardware model of the primate eye has been built that simulates the physical dynamics of the biological system. It is driven by two different analog VLSI chips, one mimicking cortical visual processing for target selection and tracking and another modeling brain stem circuits that drive the eye muscles. Our oculomotor plant demonstrates both smooth pursuit movements, driven by a retinal velocity error signal, and saccadic eye movements, controlled by retinal position error, and can reproduce several behavioral, stimulation, lesion, and adaptation experiments performed on primates. PMID:9950732

  16. Reciprocating Saw for Silicon Wafers

    NASA Technical Reports Server (NTRS)

    Morrison, A. D.; Collins, E. R., Jr.

    1985-01-01

    Concept increases productivity and wafer quality. Cutting wafers from silicon ingots produces smooth wafers at high rates with reduced blade wear. Involves straight reciprocating saw blade and slight rotation of ingot between cutting strokes. Many parallel blades combined to cut many wafers simultaneously from ingot.

  17. Stable wafer-carrier system

    DOEpatents

    Rozenzon, Yan; Trujillo, Robert T; Beese, Steven C

    2013-10-22

    One embodiment of the present invention provides a wafer-carrier system used in a deposition chamber for carrying wafers. The wafer-carrier system includes a base susceptor and a top susceptor nested inside the base susceptor with its wafer-mounting side facing the base susceptor's wafer-mounting side, thereby forming a substantially enclosed narrow channel. The base susceptor provides an upward support to the top susceptor.

  18. SSI/MSI/LSI/VLSI/ULSI.

    ERIC Educational Resources Information Center

    Alexander, George

    1984-01-01

    Discusses small-scale integrated (SSI), medium-scale integrated (MSI), large-scale integrated (LSI), very large-scale integrated (VLSI), and ultra large-scale integrated (ULSI) chips. The development and properties of these chips, uses of gallium arsenide, Josephson devices (two superconducting strips sandwiching a thin insulator), and future…

  19. Wafer level reliability testing: An idea whose time has come

    NASA Technical Reports Server (NTRS)

    Trapp, O. D.

    1987-01-01

    Wafer level reliability testing has been nurtured in the DARPA supported workshops, held each autumn since 1982. The seeds planted in 1982 have produced an active crop of very large scale integration manufacturers applying wafer level reliability test methods. Computer Aided Reliability (CAR) is a new seed being nurtured. Users are now being awakened by the huge economic value of the wafer reliability testing technology.

  20. Wafer screening device and methods for wafer screening

    DOEpatents

    Sopori, Bhushan; Rupnowski, Przemyslaw

    2014-07-15

    Wafer breakage is a serious problem in the photovoltaic industry because a large fraction of wafers (between 5 and 10%) break during solar cell/module fabrication. The major cause of this excessive wafer breakage is that these wafers have residual microcracks--microcracks that were not completely etched. Additional propensity for breakage is caused by texture etching and incomplete edge grinding. To eliminate the cost of processing the wafers that break, it is best to remove them prior to cell fabrication. Some attempts have been made to develop optical techniques to detect microcracks. Unfortunately, it is very difficult to detect microcracks that are embedded within the roughness/texture of the wafers. Furthermore, even if such detection is successful, it is not straightforward to relate them to wafer breakage. We believe that the best way to isolate the wafers with fatal microcracks is to apply a stress to wafers--a stress that mimics the highest stress during cell/module processing. If a wafer survives this stress, it has a high probability of surviving without breakage during cell/module fabrication. Based on this, we have developed a high throughput, noncontact method for applying a predetermined stress to a wafer. The wafers are carried on a belt through a chamber that illuminates the wafer with an intense light of a predetermined intensity distribution that can be varied by changing the power to the light source. As the wafers move under the light source, each wafer undergoes a dynamic temperature profile that produces a preset elastic stress. If this stress exceeds the wafer strength, the wafer will break. The broken wafers are separated early, eliminating cost of processing into cell/module. We will describe details of the system and show comparison of breakage statistics with the breakage on a production line.

  1. A programmable analog VLSI neural network processor for communication receivers.

    PubMed

    Choi, J; Bang, S H; Sheu, B J

    1993-01-01

    An analog VLSI neural network processor was designed and fabricated for communication receiver applications. It does not require prior estimation of the channel characteristics. A powerful channel equalizer was implemented with this processor chip configured as a four-layered perceptron network. The compact synapse cell is realized with an enhanced wide-range Gilbert multiplier circuit. The output neuron consists of a linear current-to-voltage converter and a sigmoid function generator with a controllable voltage gain. Network training is performed by the modified Kalman neuro-filtering algorithm to speed up the convergence process for intersymbol interference and white Gaussian noise communication channels. The learning process is done in the companion DSP board which also keeps the synapse weight for later use of the chip. The VLSI neural network processor chip occupies a silicon area of 4.6 mmx6.8 mm and was fabricated in a 2-mum double-polysilicon CMOS technology. System analysis and experimental results are presented. PMID:18267752

  2. AWV: high-throughput cross-array cross-wafer variation mapping

    NASA Astrophysics Data System (ADS)

    Yeo, Jeong-Ho; Lee, Byoung-Ho; Lee, Tae-Yong; Greenberg, Gadi; Meshulach, Doron; Ravid, Erez; Levi, Shimon; Kan, Kobi; Shabtay, Saar; Cohen, Yehuda; Rotlevi, Ofer

    2008-03-01

    Minute variations in advanced VLSI manufacturing processes are well known to significantly impact device performance and die yield. These variations drive the need for increased measurement sampling with a minimal impact on Fab productivity. Traditional discrete measurements such as CDSEM or OCD, provide, statistical information for process control and monitoring. Typically these measurements require a relatively long time and cover only a fraction of the wafer area. Across array across wafer variation mapping ( AWV) suggests a new approach for high throughput, full wafer process variation monitoring, using a DUV bright-field inspection tool. With this technique we present a full wafer scanning, visualizing the variation trends within a single die and across the wafer. The underlying principle of the AWV inspection method is to measure variations in the reflected light from periodic structures, under optimized illumination and collection conditions. Structural changes in the periodic array induce variations in the reflected light. This information is collected and analyzed in real time. In this paper we present AWV concept, measurements and simulation results. Experiments were performed using a DUV bright-field inspection tool (UVision (TM), Applied Materials) on a memory short loop experiment (SLE), Focus Exposure Matrix (FEM) and normal wafers. AWV and CDSEM results are presented to reflect CD variations within a memory array and across wafers.

  3. Parallel optical interconnects utilizing VLSI/FLC spatial light modulators

    NASA Astrophysics Data System (ADS)

    Genco, Sheryl M.

    1991-12-01

    Interconnection architectures are a cornerstone of parallel computing systems. However, interconnections can be a bottleneck in conventional computer architectures because of queuing structures that are necessary to handle the traffic through a switch at very high data rates and bandwidths. These issues must find new solutions to advance the state of the art in computing beyond the fundamental limit of silicon logic technology. Today's optoelectronic (OE) technology in particular VLSI/FLC spatial light modulators (SLMs) can provide a unique and innovative solution to these issues. This paper reports on the motivations for the system, describes the major areas of architectural requirements, discusses interconnection topologies and processor element alternatives, and documents an optical arbitration (i.e., control) scheme using `smart' SLMs and optical logic gates. The network topology is given in section 2.1 `Architectural Requirements -- Networks,' but it should be noted that the emphasis is on the optical control scheme (section 2.4) and the system.

  4. Structured wafer for device processing

    SciTech Connect

    Okandan, Murat; Nielson, Gregory N

    2014-05-20

    A structured wafer that includes through passages is used for device processing. Each of the through passages extends from or along one surface of the structured wafer and forms a pattern on a top surface area of the structured wafer. The top surface of the structured wafer is bonded to a device layer via a release layer. Devices are processed on the device layer, and are released from the structured wafer using etchant. The through passages within the structured wafer allow the etchant to access the release layer to thereby remove the release layer.

  5. Structured wafer for device processing

    SciTech Connect

    Okandan, Murat; Nielson, Gregory N

    2014-11-25

    A structured wafer that includes through passages is used for device processing. Each of the through passages extends from or along one surface of the structured wafer and forms a pattern on a top surface area of the structured wafer. The top surface of the structured wafer is bonded to a device layer via a release layer. Devices are processed on the device layer, and are released from the structured wafer using etchant. The through passages within the structured wafer allow the etchant to access the release layer to thereby remove the release layer.

  6. Within-wafer CD variation induced by wafer shape

    NASA Astrophysics Data System (ADS)

    Huang, Chi-hao; Yang, Mars; Yang, Elvis; Yang, T. H.; Chen, K. C.

    2016-03-01

    In order to meet the increasing storage capacity demand and reduce bit cost of NAND flash memories, 3D stacked vertical flash cell array has been proposed. In constructing 3D NAND flash memories, the bit number per unit area is increased as increasing the number of stacked layers. However, the increased number of stacked layers has made the film stress control extremely important for maintaining good process quality. The residual film stress alters the wafer shape accordingly several process impacts have been readily observed across wafer, such as film deposition non-uniformity, etch rate non-uniformity, wafer chucking error on scanner, materials coating/baking defects, overlay degradation and critical dimension (CD) non-uniformity. The residual tensile and compressive stresses on wafers will result in concave and convex wafer shapes, respectively. This study investigates within-wafer CD uniformity (CDU) associated with wafer shape change induced by the 3D NAND flash memory processes. Within-wafer CDU was correlated with several critical parameters including different wafer bow heights of concave and convex wafer shapes, photo resists with different post exposure baking (PEB) temperature sensitivities, and DoseMapper compensation. The results indicated the trend of within-wafer CDU maintains flat for convex wafer shapes with bow height up to +230um and concave wafer shapes with bow height ranging from 0 ~ -70um, while the within-wafer CDU trends up from -70um to -246um wafer bow heights. To minimize the within-wafer CD distribution induced by wafer warpage, carefully tailoring the film stack and thermal budget in the process flow for maintaining the wafer shape at CDU friendly range is indispensable and using photo-resist materials with lower PEB temperature sensitivity is also suggested. In addition, DoseMapper compensation is also an alternative to greatly suppress the within-wafer CD non-uniformity but the photo-resist profile variation induced by across-wafer

  7. Architecture for VLSI design of Reed-Solomon encoders

    NASA Technical Reports Server (NTRS)

    Liu, K. Y.

    1981-01-01

    The logic structure of a universal VLSI chip called the symbol-slice Reed-Solomon (RS) encoder chip is discussed. An RS encoder can be constructed by cascading and properly interconnecting a group of such VLSI chips. As a design example, it is shown that a (255,223) RD encoder requiring around 40 discrete CMOS ICs may be replaced by an RS encoder consisting of four identical interconnected VLSI RS encoder chips. Besides the size advantage, the VLSI RS encoder also has the potential advantages of requiring less power and having a higher reliability.

  8. A Parallel VLSI Direction Finding Algorithm

    NASA Astrophysics Data System (ADS)

    van der Veen, Alle-Jan; Deprettere, Ed F.

    1988-02-01

    In this paper, we present a parallel VLSI architecture that is matched to a class of direction (frequency, pole) finding algorithms of type ESPRIT. The problem is modeled in such a way that it allows an easy to partition full parallel VLSI implementation, using unitary transformations only. The hard problem, the generalized Schur decomposition of a matrix pencil, is tackled using a modified Stewart Jacobi approach that improves convergence and simplifies parameter computations. The proposed architecture is a fixed size, 2-layer Jacobi iteration array that is matched to all sub-problems of the main problem: 2 QR-factorizations, 2 SVD's and a single GSD-problem. The arithmetic used is (pipelined) Cordic.

  9. Etching Of Semiconductor Wafer Edges

    DOEpatents

    Kardauskas, Michael J.; Piwczyk, Bernhard P.

    2003-12-09

    A novel method of etching a plurality of semiconductor wafers is provided which comprises assembling said plurality of wafers in a stack, and subjecting said stack of wafers to dry etching using a relatively high density plasma which is produced at atmospheric pressure. The plasma is focused magnetically and said stack is rotated so as to expose successive edge portions of said wafers to said plasma.

  10. Leak detection utilizing analog binaural (VLSI) techniques

    NASA Technical Reports Server (NTRS)

    Hartley, Frank T. (Inventor)

    1995-01-01

    A detection method and system utilizing silicon models of the traveling wave structure of the human cochlea to spatially and temporally locate a specific sound source in the presence of high noise pandemonium. The detection system combines two-dimensional stereausis representations, which are output by at least three VLSI binaural hearing chips, to generate a three-dimensional stereausis representation including both binaural and spectral information which is then used to locate the sound source.

  11. Systolic VLSI Reed-Solomon Decoder

    NASA Technical Reports Server (NTRS)

    Shao, H. M.; Truong, T. K.; Deutsch, L. J.; Yuen, J. H.

    1986-01-01

    Decoder for digital communications provides high-speed, pipelined ReedSolomon (RS) error-correction decoding of data streams. Principal new feature of proposed decoder is modification of Euclid greatest-common-divisor algorithm to avoid need for time-consuming computations of inverse of certain Galois-field quantities. Decoder architecture suitable for implementation on very-large-scale integrated (VLSI) chips with negative-channel metaloxide/silicon circuitry.

  12. Modular VLSI Reed-Solomon Decoder

    NASA Technical Reports Server (NTRS)

    Hsu, In-Shek; Truong, Trieu-Kie

    1991-01-01

    Proposed Reed-Solomon decoder contains multiple very-large-scale integrated (VLSI) circuit chips of same type. Each chip contains sets of logic cells and subcells performing functions from all stages of decoding process. Full decoder assembled by concatenating chips, with selective utilization of cells in particular chips. Cost of development reduced by factor of 5. In addition, decoder programmable in field and switched between 8-bit and 10-bit symbol sizes.

  13. Modular VLSI Reed-Solomon Decoder

    NASA Technical Reports Server (NTRS)

    Liu, K. Y.

    1986-01-01

    Proposed Reed-Solomon (RS) decoder assembled from very-large-scale integrated-circuit (VLSI) building blocks. Decoder exploits recursive forms in RS decoding algorithms. RS codes capable of correcting random or burst errors in telemetry and other data-communication signals. Because of small size and low power consumption, advantageous to employ several such decoders in parallel-processing scheme to increase decoding speed.

  14. VLSI Microsystem for Rapid Bioinformatic Pattern Recognition

    NASA Technical Reports Server (NTRS)

    Fang, Wai-Chi; Lue, Jaw-Chyng

    2009-01-01

    A system comprising very-large-scale integrated (VLSI) circuits is being developed as a means of bioinformatics-oriented analysis and recognition of patterns of fluorescence generated in a microarray in an advanced, highly miniaturized, portable genetic-expression-assay instrument. Such an instrument implements an on-chip combination of polymerase chain reactions and electrochemical transduction for amplification and detection of deoxyribonucleic acid (DNA).

  15. Minimum wafer thickness by rotated ingot ID wafering. [Inner Diameter

    NASA Technical Reports Server (NTRS)

    Chen, C. P.; Leipold, M. H.

    1984-01-01

    The efficient utilization of materials is critical to certain device applications such as silicon for photovoltaics or diodes and gallium-gadolinium-garnet for memories. A variety of slicing techniques has been investigated to minimize wafer thickness and wafer kerf. This paper presents the results of analyses of ID wafering of rotated ingots based on predicted fracture behavior of the wafer as a result of forces during wafering and the properties of the device material. The analytical model indicated that the minimum wafer thickness is controlled by the depth of surface damage and the applied cantilever force. Both of these factors should be minimized. For silicon, a minimum thickness was found to be approximately 200 x 10 - 6th m for conventional sizes of rotated ingot wafering. Fractures through the thickness of the wafer rather than through the center supporting column were found to limit the minimum wafer thickness. The model suggested that the use of a vacuum chuck on the wafer surface to enhance cleavage fracture of the center supporting core and, with silicon, by using 111-line-type ingots could have potential for reducing minimum wafer thickness.

  16. Wafer plane inspection evaluated for photomask production

    NASA Astrophysics Data System (ADS)

    Gallagher, Emily; Badger, Karen; Lawliss, Mark; Kodera, Yutaka; Azpiroz, Jaione Tirapu; Pang, Song; Zhang, Hongqin; Eugenieva, Eugenia; Clifford, Chris; Goonesekera, Arosha; Tian, Yibin

    2008-10-01

    Wafer Plane Inspection (WPI) is a novel approach to inspection, developed to enable high inspectability on fragmented mask features at the optimal defect sensitivity. It builds on well-established high resolution inspection capabilities to complement existing manufacturing methods. The production of defect-free photomasks is practical today only because of informed decisions on the impact of defects identified. The defect size, location and its measured printing impact can dictate that a mask is perfectly good for lithographic purposes. This inspection - verification - repair loop is timeconsuming and is predicated on the fact that detectable photomask defects do not always resolve or matter on wafer. This paper will introduce and evaluate an alternative approach that moves the mask inspection to the wafer plane. WPI uses a high NA inspection of the mask to construct a physical mask model. This mask model is used to create the mask image in the wafer plane. Finally, a threshold model is applied to enhance sensitivity to printing defects. WPI essentially eliminates the non-printing inspection stops and relaxes some of the pattern restrictions currently placed on incoming photomask designs. This paper outlines the WPI technology and explores its application to patterns and substrates representative of 32nm designs. The implications of deploying Wafer Plane Inspection will be discussed.

  17. Recovery Act: Novel Kerf-Free PV Wafering that provides a low-cost approach to generate wafers from 150um to 50um in thickness

    SciTech Connect

    Fong, Theodore E.

    2013-05-06

    The technical paper summarizes the project work conducted in the development of Kerf-Free silicon wafering equipment for silicon solar wafering. This new PolyMax technology uses a two step process of implantation and cleaving to exfoliate 50um to 120um wafers with thicknesses ranging from 50um to 120um from a 125mm or 156mm pseudo-squared silicon ingot. No kerf is generated using this method of wafering. This method of wafering contrasts with the current method of making silicon solar wafers using the industry standard wire saw equipment. The report summarizes the activity conducted by Silicon Genesis Corporation in working to develop this technology further and to define the roadmap specifications for the first commercial proto-type equipment for high volume solar wafer manufacturing using the PolyMax technology.

  18. Replacing design rules in the VLSI design cycle

    NASA Astrophysics Data System (ADS)

    Hurley, Paul; Kryszczuk, Krzysztof

    2012-03-01

    We make a case for the migration of Design Rule Check (DRC), the first step in the modern VLSI design process, to a model-based system. DRC uses a large set of rules to determine permitted designs. We argue that it is a legacy of the past: slow, labor intensive, ad-hoc, inaccurate and too restrictive. We envisage the replacement of DRC and printability simulation by a signal processing and machine learning-based approach for 22nm technology nodes and beyond. Such a process would produce fast, accurate, autonomous printability prediction for optical lithography. As such, we built a proof-of-concept demonstrator that can predict OPC problems using a trained classifier without the need to fall back on costly first-principle simulation. For one sample test site, and for the OPC Line Width error type OPC violation marker, the demonstrator obtained an Equal Error Rate of ca. 4%.

  19. Phase-Synchronization Early Epileptic Seizure Detector VLSI Architecture.

    PubMed

    Abdelhalim, K; Smolyakov, V; Genov, R

    2011-10-01

    A low-power VLSI processor architecture that computes in real time the magnitude and phase-synchronization of two input neural signals is presented. The processor is a part of an envisioned closed-loop implantable microsystem for adaptive neural stimulation. The architecture uses three CORDIC processing cores that require shift-and-add operations but no multiplication. The 10-bit processor synthesized and prototyped in a standard 1.2 V 0.13 μm CMOS technology utilizes 41,000 logic gates. It dissipates 3.6 μW per input pair, and provides 1.7 kS/s per-channel throughput when clocked at 2.5 MHz. The power scales linearly with the number of input channels or the sampling rate. The efficacy of the processor in early epileptic seizure detection is validated on human intracranial EEG data. PMID:23852175

  20. Cascaded VLSI Chips Help Neural Network To Learn

    NASA Technical Reports Server (NTRS)

    Duong, Tuan A.; Daud, Taher; Thakoor, Anilkumar P.

    1993-01-01

    Cascading provides 12-bit resolution needed for learning. Using conventional silicon chip fabrication technology of VLSI, fully connected architecture consisting of 32 wide-range, variable gain, sigmoidal neurons along one diagonal and 7-bit resolution, electrically programmable, synaptic 32 x 31 weight matrix implemented on neuron-synapse chip. To increase weight nominally from 7 to 13 bits, synapses on chip individually cascaded with respective synapses on another 32 x 32 matrix chip with 7-bit resolution synapses only (without neurons). Cascade correlation algorithm varies number of layers effectively connected into network; adds hidden layers one at a time during learning process in such way as to optimize overall number of neurons and complexity and configuration of network.

  1. The VLSI design of a Reed-Solomon encoder using Berlekamps bit-serial multiplier algorithm

    NASA Technical Reports Server (NTRS)

    Truong, T. K.; Deutsch, L. J.; Reed, I. S.; Hsu, I. S.; Wang, K.; Yeh, C. S.

    1982-01-01

    Realization of a bit-serial multiplication algorithm for the encoding of Reed-Solomon (RS) codes on a single VLSI chip using NMOS technology is demonstrated to be feasible. A dual basis (255, 223) over a Galois field is used. The conventional RS encoder for long codes ofter requires look-up tables to perform the multiplication of two field elements. Berlekamp's algorithm requires only shifting and exclusive-OR operations.

  2. The VLSI implementation of a Reed-Solomon encoder using Berlekamp's bit-serial multiplier algorithm

    NASA Technical Reports Server (NTRS)

    Hsu, I.-S.; Reed, I. S.; Wang, K.; Yeh, C.-S.; Truong, T. K.; Deutsch, L. J.

    1984-01-01

    Realization of a bit-serial multiplication algorithm for the encoding of Reed-Solomon (RS) codes on a single VLSI chip using NMOS technology is demonstrated to be feasible. A dual basis (255, 223) over a Galois field is used. The conventional RS encoder for long codes often requires look-up tables to perform the multiplication of two field elements. Berlekamp's algorithm requires only shifting and exclusive-OR operations.

  3. Parallel optimization algorithms and their implementation in VLSI design

    NASA Technical Reports Server (NTRS)

    Lee, G.; Feeley, J. J.

    1991-01-01

    Two new parallel optimization algorithms based on the simplex method are described. They may be executed by a SIMD parallel processor architecture and be implemented in VLSI design. Several VLSI design implementations are introduced. An application example is reported to demonstrate that the algorithms are effective.

  4. Image Compression on a VLSI Neural-Based Vector Quantizer.

    ERIC Educational Resources Information Center

    Chen, Oscal T.-C.; And Others

    1992-01-01

    Describes a modified frequency-sensitive self-organization (FSO) algorithm for image data compression and the associated VLSI architecture. Topics discussed include vector quantization; VLSI neural processor architecture; detailed circuit implementation; and a neural network vector quantization prototype chip. Examples of images using the FSO…

  5. Wafer plane inspection for advanced reticle defects

    NASA Astrophysics Data System (ADS)

    Nagpal, Rajesh; Ghadiali, Firoz; Kim, Jun; Huang, Tracy; Pang, Song

    2008-05-01

    Readiness of new mask defect inspection technology is one of the key enablers for insertion & transition of the next generation technology from development into production. High volume production in mask shops and wafer fabs demands a reticle inspection system with superior sensitivity complemented by a low false defect rate to ensure fast turnaround of reticle repair and defect disposition (W. Chou et al 2007). Wafer Plane Inspection (WPI) is a novel approach to mask defect inspection, complementing the high resolution inspection capabilities of the TeraScanHR defect inspection system. WPI is accomplished by using the high resolution mask images to construct a physical mask model (D. Pettibone et al 1999). This mask model is then used to create the mask image in the wafer aerial plane. A threshold model is applied to enhance the inspectability of printing defects. WPI can eliminate the mask restrictions imposed on OPC solutions by inspection tool limitations in the past. Historically, minimum image restrictions were required to avoid nuisance inspection stops and/or subsequent loss of sensitivity to defects. WPI has the potential to eliminate these limitations by moving the mask defect inspections to the wafer plane. This paper outlines Wafer Plane Inspection technology, and explores the application of this technology to advanced reticle inspection. A total of twelve representative critical layers were inspected using WPI die-to-die mode. The results from scanning these advanced reticles have shown that applying WPI with a pixel size of 90nm (WPI P90) captures all the defects of interest (DOI) with low false defect detection rates. In validating CD predictions, the delta CDs from WPI are compared against Aerial Imaging Measurement System (AIMS), where a good correlation is established between WPI and AIMSTM.

  6. Wafer level warpage characterization of 3D interconnect processing wafers

    NASA Astrophysics Data System (ADS)

    Chang, Po-Yi; Ku, Yi-Sha

    2012-03-01

    We present a new metrology system based on a fringe reflection method for warpage characterizations during wafer thinning and temporary bonding processes. A set of periodic fringe patterns is projected onto the measuring wafer and the reflected fringe images are captured by a CCD camera. The fringe patterns are deformed due to the slope variation of the wafer surface. We demonstrate the use of phase-shit algorithms, the wafer surface slope variation and quantitative 3D surface profile even tiny dimples and dents on a wafer can be reconstructed. The experimental results show the warpages of the bonded wafer are below 20 μm after thinning down to the nominal thickness of 75 μm and 50 μm. The measurement precision is better than 2 um.

  7. Proceedings of the Low-Cost Solar Array Wafering Workshop

    NASA Technical Reports Server (NTRS)

    Morrison, A. D.

    1982-01-01

    The technology and economics of silicon ingot wafering for low cost solar arrays were discussed. Fixed and free abrasive sawing wire, ID, and multiblade sawing, materials, mechanisms, characterization, and innovative concepts were considered.

  8. VLSI architectures for geometrical mapping problems in high-definition image processing

    NASA Astrophysics Data System (ADS)

    Kim, K.; Lee, J.

    This paper explores a VLSI architecture for geometrical mapping address computation. The geometric transformation is discussed in the context of plane projective geometry, which invokes a set of basic transformations to be implemented for the general image processing. The homogeneous and 2-dimensional cartesian coordinates are employed to represent the transformations, each of which is implemented via an augmented CORDIC as a processing element. A specific scheme for a processor, which utilizes full-pipelining at the macro-level and parallel constant-factor-redundant arithmetic and full-pipelining at the micro-level, is assessed to produce a single VLSI chip for HDTV applications using state-of-art MOS technology.

  9. High throughput VLSI architecture for multiresolution integer motion estimation in high definition AVS video encoder

    NASA Astrophysics Data System (ADS)

    Yin, HaiBing; Qi, Honggang; Xu, Hao; Xie, Xiaodong; Gao, Wen

    2010-07-01

    This paper proposes a hardware friendly multi-resolution motion estimation algorithm and VLSI architecture for high definition MPEG-like video encoder hardware implementation. By parallel searching and utilizing the high correlation in multi-resolution reference pixels, huge throughput and computation due to large search window are alleviated considerably. Sixteen way parallel processing element arrays with configurable multiplying technologies achieve fast search with regular data access and efficient data reuse. Also, the parallel arrays can be efficiently reused at three hierarchical levels for sequential motion vector refinement. The modified algorithm reaches a good balance between implementation complexity and search performance. Also, the logic circuit and on-chip SRAM consumption of the VLSI architecture are moderate.

  10. VLSI architectures for geometrical mapping problems in high-definition image processing

    NASA Technical Reports Server (NTRS)

    Kim, K.; Lee, J.

    1991-01-01

    This paper explores a VLSI architecture for geometrical mapping address computation. The geometric transformation is discussed in the context of plane projective geometry, which invokes a set of basic transformations to be implemented for the general image processing. The homogeneous and 2-dimensional cartesian coordinates are employed to represent the transformations, each of which is implemented via an augmented CORDIC as a processing element. A specific scheme for a processor, which utilizes full-pipelining at the macro-level and parallel constant-factor-redundant arithmetic and full-pipelining at the micro-level, is assessed to produce a single VLSI chip for HDTV applications using state-of-art MOS technology.

  11. Some practical issues in the design and application of a VLSI FEC chip

    NASA Astrophysics Data System (ADS)

    Wang, Qiang; Nicholson, Robert D.; Onotera, Larry Y.

    1989-09-01

    Forward error correction (FEC) has become a general requirement for digital satellite communications. The dominant technology is the use of convolutional codes with Viterbi decoding. A single-chip VLSI implementation of a convolutional encoder and Viterbi decoder for constraint length seven has been completed recently. In the design and application of the FEC chip, several practical issues had to be addressed. These include the determination of the maximum variation in path metric, generation of a convolutional encoded sequence with maximum number of transitions for symbol timing recovery, use of a unique word to detect the phase ambiguity, use of sliding window data quality monitor to resolve an ambiguous state, etc. This paper presents solutions to these problems. Although specific results are given for the standard constraint-length seven code, the methods used to obtain these results are general and can be applied to other codes. Features and implementation of the VLSI FEC chip are also discussed.

  12. Biological basis for space-variant sensor design II: implications for VLSI sensor design

    NASA Astrophysics Data System (ADS)

    Rojer, Alan S.; Schwartz, Eric L.

    1991-03-01

    We analyze the characteristics of a synthetic sensor comparable with respect to field width and resolution to the primate visual system. We estimate that 150 pixels are sufficient using a logarithmic sensor geometry and demonstrate that this calculation is consistent with known characteristics of biological vision e. g. the number of fibers in the optic nerve. To obtain the field width and resolution of the primate eye with a uniform sensor requires between iOiO'' times the number of pixels estimated for the comparable log sensor. Another interesting observation is that the field width and resolution of a conventional 512x512 sensor can be obtained with around 5000 pixels using the log geometry. We conclude with consideration of the prospects for achieving human-like performance with contemporary VLSI technology and briefly discuss progress on space-variant VLSI sensor design.

  13. Interferometric metrology of wafer nanotopography for advanced CMOS process integration

    NASA Astrophysics Data System (ADS)

    Valley, John F.; Koliopoulos, Chris L.; Tang, Shouhong

    2001-12-01

    According to industry standards (SEMI M43, Guide for Reporting Wafer Nanotopography), Nanotopography is the non- planar deviation of the whole front wafer surface within a spatial wavelength range of approximately 0.2 to 20 mm and within the fixed quality area (FQA). The need for precision metrology of wafer nanotopography is being actively addressed by interferometric technology. In this paper we present an approach to mapping the whole wafer front surface nanotopography using an engineered coherence interferometer. The interferometer acquires a whole wafer raw topography map. The raw map is then filtered to remove the long spatial wavelength, high amplitude shape contributions and reveal the nanotopography in the filtered map. Filtered maps can be quantitatively analyzed in a variety of ways to enable statistical process control (SPC) of nanotopography parameters. The importance of tracking these parameters for CMOS gate level processes at 180-nm critical dimension, and below, is examined.

  14. Unifying parametrized VLSI Jacobi algorithms and architectures

    NASA Astrophysics Data System (ADS)

    Deprettere, Ed F. A.; Moonen, Marc

    1993-11-01

    Implementing Jacobi algorithms in parallel VLSI processor arrays is a non-trivial task, in particular when the algorithms are parametrized with respect to size and the architectures are parametrized with respect to space-time trade-offs. The paper is concerned with an approach to implement several time-adaptive Jacobi-type algorithms on a parallel processor array, using only Cordic arithmetic and asynchronous communications, such that any degree of parallelism, ranging from single-processor up to full-size array implementation, is supported by a `universal' processing unit. This result is attributed to a gracious interplay between algorithmic and architectural engineering.

  15. VLSI Reed-Solomon Encoder With Interleaver

    NASA Technical Reports Server (NTRS)

    Hsu, In-Shek; Deutsch, L. J.; Truong, Trieu-Kie; Reed, I. S.

    1990-01-01

    Size, weight, and susceptibility to burst errors reduced. Encoding system built on single very-large-scale integrated (VLSI) circuit chip produces (255,223) Reed-Solomon (RS) code with programmable interleaving up to depth of 5. (225,223) RS encoder includes new remainder-and-interleaver unit providing programmable interleaving of code words. Remainder-and-interleaver unit contains shift registers and modulo-2 adders. Signals on "turn" and "no-turn" lines control depth of interleaving. Based on E. R. Berlekamp's bit-serial multiplication algorithm for (225,223) RS encoder over Galois Field (2 to the 8th power).

  16. Augmented reality for wafer prober

    NASA Astrophysics Data System (ADS)

    Gilgenkrantz, Pascal

    2011-03-01

    The link between wafer manufacturing and wafer test is often weak: without common information system, Test engineers have to read locations of test structures from reference documents and search them on the wafer prober screen. Mask Data Preparation team is ideally placed to fill this gap, given its relationship with both design and manufacturing sides. With appropriate design extraction scripts and design conventions, mask engineers can provide exact wafer locations of all embedded test structures to avoid a painful camera search. Going a step further, it would be a great help to provide to wafer probers a "map" of what was build on wafers. With this idea in mind, mask design database can simply be provided to Test engineers; but the real added value would come from a true integration of real-wafer camera views and design database used for wafer manufacturing. As proven by several augmented reality applications, like Google Maps' mixed Satellite/Map view, mixing a real-world view with its theoretical model is very useful to understand the reality. The creation of such interface can only be made by a wafer prober manufacturer, given the high integration of these machines with their control panel. But many existing software libraries could be used to plot the design view matching the camera view. Standard formats for mask design are usually GDSII and OASIS (SEMI P39 standard); multiple free software and commercial viewers/editors/libraries for these formats are available.

  17. Neural algorithms on VLSI concurrent architectures

    SciTech Connect

    Caviglia, D.D.; Bisio, G.M.; Parodi, G.

    1988-09-01

    The research concerns the study of neural algorithms for developing CAD tools with A.I. features in VLSI design activities. In this paper the focus is on optimization problems such as partitioning, placement and routing. These problems require massive computational power to be solved (NP-complete problems) and the standard approach is usually based on euristic techniques. Neural algorithms can be represented by a circuital model. This kind of representation can be easily mapped in a real circuit, which, however, features limited flexibility with respect to the variety of problems. In this sense the simulation of the neural circuit, by mapping it on a digital VLSI concurrent architecture seems to be preferrable; in addition this solution offers a wider choice with regard to algorithms characteristics (e.g. transfer curve of neural elements, reconfigurability of interconnections, etc.). The implementation with programmable components, such as transputers, allows an indirect mapping of the algorithm (one transputer for N neurons) accordingly to the dimension and the characteristics of the problem. In this way the neural algorithm described by the circuit is reduced to the algorithm that simulates the network behavior. The convergence properties of that formulation are studied with respect to the characteristics of the neural element transfer curve.

  18. Laser Microchemistry : A Powerful Tool For VLSI

    NASA Astrophysics Data System (ADS)

    Tonneau, Didier; Guern, Yves; Pelous, Gerard

    1989-01-01

    Interconnection direct writing on ICs is possible by localized laser-assisted Chemical Vapor Deposition. Recently we have developed and marketed a new laser microchemistry tool particularly designed for VLSI prototypes rewiring. By dissociating Ni(CO)4 molecules, Ni lines can be written at speeds higher than 5 gm/s under laser induced temperature as low as 400°C. At the same temperature tungsten stripes can be driven from decomposition of WF6-H2 mixtures. However the tungsten deposition rate is about two orders of magnitude lower than the nickel growth rate in the same temperature conditions. The resistivities of the deposits are in both cases around 10 μΩ.cm. Silicon dioxide layers can be promoted from dissociation of a Si2H6-N20 mixture under surface temperature around 500°C. These metal and insulator deposition basic steps have been integrated in a complete metal bridging process suitable for the last interconnection level of a VLSI circuit. This process has been firstly estimated from a functional point of view, by electrical characterizations realized on test patterns entirely drawn by laser chemistry. At least, by measuring the time necessary to perform a metal bridge, the process has been evaluated from an economical point of view.

  19. Wafer-scale micro-optics fabrication

    NASA Astrophysics Data System (ADS)

    Voelkel, Reinhard

    2012-07-01

    Micro-optics is an indispensable key enabling technology for many products and applications today. Probably the most prestigious examples are the diffractive light shaping elements used in high-end DUV lithography steppers. Highly-efficient refractive and diffractive micro-optical elements are used for precise beam and pupil shaping. Micro-optics had a major impact on the reduction of aberrations and diffraction effects in projection lithography, allowing a resolution enhancement from 250 nm to 45 nm within the past decade. Micro-optics also plays a decisive role in medical devices (endoscopes, ophthalmology), in all laser-based devices and fiber communication networks, bringing high-speed internet to our homes. Even our modern smart phones contain a variety of micro-optical elements. For example, LED flash light shaping elements, the secondary camera, ambient light and proximity sensors. Wherever light is involved, micro-optics offers the chance to further miniaturize a device, to improve its performance, or to reduce manufacturing and packaging costs. Wafer-scale micro-optics fabrication is based on technology established by the semiconductor industry. Thousands of components are fabricated in parallel on a wafer. This review paper recapitulates major steps and inventions in wafer-scale micro-optics technology. The state-of-the-art of fabrication, testing and packaging technology is summarized.

  20. 1366 Direct Wafer: Demolishing the Cost Barrier for Silicon Photovoltaics

    SciTech Connect

    Lorenz, Adam

    2013-08-30

    The goal of 1366 Direct Wafer™ is to drastically reduce the cost of silicon-based PV by eliminating the cost barrier imposed by sawn wafers. The key characteristics of Direct Wafer are 1) kerf-free, 156-mm standard silicon wafers 2) high throughput for very low CAPEX and rapid scale up. Together, these characteristics will allow Direct Wafer™ to become the new standard for silicon PV wafers and will enable terawatt-scale PV – a prospect that may not be possible with sawn wafers. Our single, high-throughput step will replace the expensive and rate-limiting process steps of ingot casting and sawing, thereby enabling drastically lower wafer cost. This High-Impact PV Supply Chain project addressed the challenges of scaling Direct Wafer technology for cost-effective, high-throughput production of commercially viable 156 mm wafers. The Direct Wafer process is inherently simple and offers the potential for very low production cost, but to realize this, it is necessary to demonstrate production of wafers at high-throughput that meet customer specifications. At the start of the program, 1366 had demonstrated (with ARPA-E funding) increases in solar cell efficiency from 10% to 15.9% on small area (20cm2), scaling wafer size up to the industry standard 156mm, and demonstrated initial cell efficiency on larger wafers of 13.5%. During this program, the throughput of the Direct Wafer furnace was increased by more than 10X, simultaneous with quality improvements to meet early customer specifications. Dedicated equipment for laser trimming of wafers and measurement methods were developed to feedback key quality metrics to improve the process and equipment. Subsequent operations served both to determine key operating metrics affecting cost, as well as generating sample product that was used for developing downstream processing including texture and interaction with standard cell processing. Dramatic price drops for silicon wafers raised the bar significantly, but the

  1. Wavelength-encoded OCDMA system using opto-VLSI processors

    NASA Astrophysics Data System (ADS)

    Aljada, Muhsen; Alameh, Kamal

    2007-07-01

    We propose and experimentally demonstrate a 2.5 Gbits/sper user wavelength-encoded optical code-division multiple-access encoder-decoder structure based on opto-VLSI processing. Each encoder and decoder is constructed using a single 1D opto-very-large-scale-integrated (VLSI) processor in conjunction with a fiber Bragg grating (FBG) array of different Bragg wavelengths. The FBG array spectrally and temporally slices the broadband input pulse into several components and the opto-VLSI processor generates codewords using digital phase holograms. System performance is measured in terms of the autocorrelation and cross-correlation functions as well as the eye diagram.

  2. Wavelength-encoded OCDMA system using opto-VLSI processors.

    PubMed

    Aljada, Muhsen; Alameh, Kamal

    2007-07-01

    We propose and experimentally demonstrate a 2.5 Gbits/sper user wavelength-encoded optical code-division multiple-access encoder-decoder structure based on opto-VLSI processing. Each encoder and decoder is constructed using a single 1D opto-very-large-scale-integrated (VLSI) processor in conjunction with a fiber Bragg grating (FBG) array of different Bragg wavelengths. The FBG array spectrally and temporally slices the broadband input pulse into several components and the opto-VLSI processor generates codewords using digital phase holograms. System performance is measured in terms of the autocorrelation and cross-correlation functions as well as the eye diagram. PMID:17603568

  3. Process variation monitoring (PVM) by wafer inspection tool as a complementary method to CD-SEM for mapping LER and defect density on production wafers

    NASA Astrophysics Data System (ADS)

    Shabtay, Saar; Blumberg, Yuval; Levi, Shimon; Greenberg, Gadi; Harel, Daniel; Conley, Amiad; Meshulach, Doron; Kan, Kobi; Dolev, Ido; Kumar, Surender; Mendel, Kalia; Goto, Kaori; Yamaguchi, Naoaki; Iriuchijima, Yasuhiro; Nakamura, Shinichi; Nagaoka, Shirou; Sekito, Toshiyuki

    2009-03-01

    As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) constitute a higher percentage of the line-width and hence the need to control these parameters increases. Sources of CDU and LER variations include: scanner auto-focus accuracy and stability, lithography stack thickness and composition variations, exposure variations, etc. These process variations in advanced VLSI manufacturing processes, specifically in memory devices where CDU and LER affect cell-to-cell parametric variations, are well known to significantly impact device performance and die yield. Traditionally, measurements of LER are performed by CD-SEM or Optical Critical Dimension (OCD) metrology tools. Typically, these measurements require a relatively long time and cover only a small fraction of the wafer area. In this paper we present the results of a collaborative work of the Process Diagnostic & Control Business Unit of Applied Materials® and Nikon Corporation®, on the implementation of a complementary method to the CD-SEM and OCD tools, to monitor post litho develop CDU and LER on production wafers. The method, referred to as Process Variation Monitoring (PVM), is based on measuring variations in the light reflected from periodic structures, under optimized illumination and collection conditions, and is demonstrated using Applied Materials DUV brightfield (BF) wafer inspection tool. It will be shown that full polarization control in illumination and collection paths of the wafer inspection tool is critical to enable to set an optimized Process Variation Monitoring recipe.

  4. Gettering Silicon Wafers with Phosphorus

    NASA Technical Reports Server (NTRS)

    Daiello, R. V.

    1983-01-01

    Silicon wafers subjected to gettering in phosphorus atmosphere have longer diffusion lengths and higher solar-cell efficiencies than untreated wafers. Gettering treatment improves properties of solar cells manufactured from impure silicon and is compatible with standard solar-cell processing.

  5. NASA Space Engineering Research Center Symposium on VLSI Design

    NASA Technical Reports Server (NTRS)

    Maki, Gary K.

    1990-01-01

    The NASA Space Engineering Research Center (SERC) is proud to offer, at its second symposium on VLSI design, presentations by an outstanding set of individuals from national laboratories and the electronics industry. These featured speakers share insights into next generation advances that will serve as a basis for future VLSI design. Questions of reliability in the space environment along with new directions in CAD and design are addressed by the featured speakers.

  6. An efficient VLSI architecture for template matching

    SciTech Connect

    Ranganathan, N.; Venugopal, S.

    1994-12-31

    In this paper, we describe a new special purpose VLSI architecture for template matching, based on a technique known as moment preserving pattern matching (MPPM). This technique first converts the given gray scale image and template into binary form using the moment preserving quantization method and then uses a pairing function to compute the similarity measure. The technique yields accurate results comparable to other approaches but involves simpler computations. The proposed architecture is systolic in nature and achieves a high degree of parallelism and pipelining. It is shown that the proposed architecture is much simpler, achieves higher speed, has a lower hardware complexity and utilizes lesser memory than other special purpose architectures for template matching.

  7. Implementation of optical interconnections for VLSI

    NASA Technical Reports Server (NTRS)

    Wu, Wennie H.; Bergman, Larry A.; Johnston, Alan R.; Guest, Clark C.; Esener, Sadik C.

    1987-01-01

    This paper reports on the progress in implementing optical interconnections for VLSI. Four areas are covered: (1) the holographic optical element (HOE), (2) the laser sources, (3) the detectors and associated circuits forming an optically addressed gate, and (4) interconnection experiments in which five gates are actuated from one source. A laser scanner system with a resolution of 12 x 20 microns has been utilized to generate the HOEs. Diffraction efficiency of the HOE and diffracted spot size have been measured. Stock lasers have been modified with a high-frequency package for interconnect experiments, and buried heterostructure fabrication techniques have been pursued. Measurements have been made on the fabricated photodetectors to determine dark current, responsivity, and response time. The optical gates and the overall chip have been driven successfully with an input light beam, as well as with the optical signal interconnected through the one to five holograms.

  8. VLSI processors for signal detection in SETI

    NASA Technical Reports Server (NTRS)

    Duluk, J. F.; Linscott, I. R.; Peterson, A. M.; Burr, J.; Ekroot, B.; Twicken, J.

    1989-01-01

    The objective of the Search for Extraterrestrial Intelligence (SETI) is to locate an artificially created signal coming from a distant star. This is done in two steps: (1) spectral analysis of an incoming radio frequency band, and (2) pattern detection for narrow-band signals. Both steps are computationally expensive and require the development of specially designed computer architectures. To reduce the size and cost of the SETI signal detection machine, two custom VLSI chips are under development. The first chip, the SETI DSP Engine, is used in the spectrum analyzer and is specially designed to compute Discrete Fourier Transforms (DFTs). It is a high-speed arithmetic processor that has two adders, one multiplier-accumulator, and three four-port memories. The second chip is a new type of Content-Addressable Memory. It is the heart of an associative processor that is used for pattern detection. Both chips incorporate many innovative circuits and architectural features.

  9. VLSI Design of a Turbo Decoder

    NASA Technical Reports Server (NTRS)

    Fang, Wai-Chi

    2007-01-01

    A very-large-scale-integrated-circuit (VLSI) turbo decoder has been designed to serve as a compact, high-throughput, low-power, lightweight decoder core of a receiver in a data-communication system. In a typical contemplated application, such a decoder core would be part of a single integrated circuit that would include the rest of the receiver circuitry and possibly some or all of the transmitter circuitry, all designed and fabricated together according to an advanced communication-system-on-a-chip design concept. Turbo codes are forward-error-correction (FEC) codes. Relative to older FEC codes, turbo codes enable communication at lower signal-to-noise ratios and offer greater coding gain. In addition, turbo codes can be implemented by relatively simple hardware. Therefore, turbo codes have been adopted as standard for some advanced broadband communication systems.

  10. Hierarchical Design and Verification for VLSI

    NASA Technical Reports Server (NTRS)

    Shostak, R. E.; Elliott, W. D.; Levitt, K. N.

    1983-01-01

    The specification and verification work is described in detail, and some of the problems and issues to be resolved in their application to Very Large Scale Integration VLSI systems are examined. The hierarchical design methodologies enable a system architect or design team to decompose a complex design into a formal hierarchy of levels of abstraction. The first step inprogram verification is tree formation. The next step after tree formation is the generation from the trees of the verification conditions themselves. The approach taken here is similar in spirit to the corresponding step in program verification but requires modeling of the semantics of circuit elements rather than program statements. The last step is that of proving the verification conditions using a mechanical theorem-prover.

  11. PLA realizations for VLSI state machines

    NASA Technical Reports Server (NTRS)

    Gopalakrishnan, S.; Whitaker, S.; Maki, G.; Liu, K.

    1990-01-01

    A major problem associated with state assignment procedures for VLSI controllers is obtaining an assignment that produces minimal or near minimal logic. The key item in Programmable Logic Array (PLA) area minimization is the number of unique product terms required by the design equations. This paper presents a state assignment algorithm for minimizing the number of product terms required to implement a finite state machine using a PLA. Partition algebra with predecessor state information is used to derive a near optimal state assignment. A maximum bound on the number of product terms required can be obtained by inspecting the predecessor state information. The state assignment algorithm presented is much simpler than existing procedures and leads to the same number of product terms or less. An area-efficient PLA structure implemented in a 1.0 micron CMOS process is presented along with a summary of the performance for a controller implemented using this design procedure.

  12. Finite element computation with parallel VLSI

    NASA Technical Reports Server (NTRS)

    Mcgregor, J.; Salama, M.

    1983-01-01

    This paper describes a parallel processing computer consisting of a 16-bit microcomputer as a master processor which controls and coordinates the activities of 8086/8087 VLSI chip set slave processors working in parallel. The hardware is inexpensive and can be flexibly configured and programmed to perform various functions. This makes it a useful research tool for the development of, and experimentation with parallel mathematical algorithms. Application of the hardware to computational tasks involved in the finite element analysis method is demonstrated by the generation and assembly of beam finite element stiffness matrices. A number of possible schemes for the implementation of N-elements on N- or n-processors (N is greater than n) are described, and the speedup factors of their time consumption are determined as a function of the number of available parallel processors.

  13. Analog VLSI system for active drag reduction

    SciTech Connect

    Gupta, B.; Goodman, R.; Jiang, F.; Tai, Y.C.; Tung, S.; Ho, C.M.

    1996-10-01

    In today`s cost-conscious air transportation industry, fuel costs are a substantial economic concern. Drag reduction is an important way to reduce costs. Even a 5% reduction in drag translates into estimated savings of millions of dollars in fuel costs. Drawing inspiration from the structure of shark skin, the authors are building a system to reduce drag along a surface. Our analog VLSI system interfaces with microfabricated, constant-temperature shear stress sensors. It detects regions of high shear stress and outputs a control signal to activate a microactuator. We are in the process of verifying the actual drag reduction by controlling microactuators in wind tunnel experiments. We are encouraged that an approach similar to one that biology employs provides a very useful contribution to the problem of drag reduction. 9 refs., 21 figs.

  14. VLSI processors for signal detection in SETI.

    PubMed

    Duluk, J F; Linscott, I R; Peterson, A M; Burr, J; Ekroot, B; Twicken, J

    1989-01-01

    The objective of the Search for Extraterrestrial Intelligence (SETI) is to locate an artificially created signal coming from a distant star. This is done in two steps: (1) spectral analysis of an incoming radio frequency band, and (2) pattern detection for narrow-band signals. Both steps are computationally expensive and require the development of specially designed computer architectures. To reduce the size and cost of the SETI signal detection machine, two custom VLSI chips are under development. The first chip, the SETI DSP Engine, is used in the spectrum analyzer and is specially designed to compute Discrete Fourier Transforms (DFTs). It is a high-speed arithmetic processor that has two adders, one multiplier-accumulator, and three four-port memories. The second chip is a new type of Content-Addressable Memory. It is the heart of an associative processor that is used for pattern detection. Both chips incorporate many innovative circuits and architectural features. PMID:11537749

  15. Periodic binary sequence generators: VLSI circuits considerations

    NASA Technical Reports Server (NTRS)

    Perlman, M.

    1984-01-01

    Feedback shift registers are efficient periodic binary sequence generators. Polynomials of degree r over a Galois field characteristic 2(GF(2)) characterize the behavior of shift registers with linear logic feedback. The algorithmic determination of the trinomial of lowest degree, when it exists, that contains a given irreducible polynomial over GF(2) as a factor is presented. This corresponds to embedding the behavior of an r-stage shift register with linear logic feedback into that of an n-stage shift register with a single two-input modulo 2 summer (i.e., Exclusive-OR gate) in its feedback. This leads to Very Large Scale Integrated (VLSI) circuit architecture of maximal regularity (i.e., identical cells) with intercell communications serialized to a maximal degree.

  16. VLSI processors for signal detection in SETI

    NASA Astrophysics Data System (ADS)

    Duluk, J. F.; Linscott, I. R.; Peterson, A. M.; Burr, J.; Ekroot, B.; Twicken, J.

    The objective of the Search for Extraterrestrial Intelligence (SETI) is to locate an artifically created signal coming from a distant star. This is done in two steps: (1) spectral analysis of an incoming radio frequency band, and (2) pattern detection for narrow-band signals. Both steps are computationally expensive and require the development of specially designed computer architectures. To reduce the size and cost of the SETI signal detection machine, two custom VLSI chips are under development. The first chip, the SETI DSP Engine, is used in the spectrum analyzer and is specially designed to compute Discrete Fourier Transforms (DFTs). It is a high-speed arithmetic processor that has two adders, one multiplier-accumulator, and three four-port memories. The second chip is a new type of Content-Addressable Memory. It is the heart of an associative processor that is used for pattern detection. Both chips incoporate many innovative circuits and architectural features.

  17. Analog VLSI neural network integrated circuits

    NASA Technical Reports Server (NTRS)

    Kub, F. J.; Moon, K. K.; Just, E. A.

    1991-01-01

    Two analog very large scale integration (VLSI) vector matrix multiplier integrated circuit chips were designed, fabricated, and partially tested. They can perform both vector-matrix and matrix-matrix multiplication operations at high speeds. The 32 by 32 vector-matrix multiplier chip and the 128 by 64 vector-matrix multiplier chip were designed to perform 300 million and 3 billion multiplications per second, respectively. An additional circuit that has been developed is a continuous-time adaptive learning circuit. The performance achieved thus far for this circuit is an adaptivity of 28 dB at 300 KHz and 11 dB at 15 MHz. This circuit has demonstrated greater than two orders of magnitude higher frequency of operation than any previous adaptive learning circuit.

  18. Synthesis algorithm of VLSI multipliers for ASIC

    NASA Technical Reports Server (NTRS)

    Chua, O. H.; Eldin, A. G.

    1993-01-01

    Multipliers are critical sub-blocks in ASIC design, especially for digital signal processing and communications applications. A flexible multiplier synthesis tool is developed which is capable of generating multiplier blocks for word size in the range of 4 to 256 bits. A comparison of existing multiplier algorithms is made in terms of speed, silicon area, and suitability for automated synthesis and verification of its VLSI implementation. The algorithm divides the range of supported word sizes into sub-ranges and provides each sub-range with a specific multiplier architecture for optimal speed and area. The algorithm of the synthesis tool and the multiplier architectures are presented. Circuit implementation and the automated synthesis methodology are discussed.

  19. VLED for Si wafer-level packaging

    NASA Astrophysics Data System (ADS)

    Chu, Chen-Fu; Chen, Chiming; Yen, Jui-Kang; Chen, Yung-Wei; Tsou, Chingfu; Chang, Chunming; Doan, Trung; Tran, Chuong Anh

    2012-03-01

    In this paper, we introduced the advantages of Vertical Light emitting diode (VLED) on copper alloy with Si-wafer level packaging technologies. The silicon-based packaging substrate starts with a <100> dou-ble-side polished p-type silicon wafer, then anisotropic wet etching technology is done to construct the re-flector depression and micro through-holes on the silicon substrate. The operating voltage, at a typical cur-rent of 350 milli-ampere (mA), is 3.2V. The operation voltage is less than 3.7V under higher current driving conditions of 1A. The VLED chip on Si package has excellent heat dissipation and can be operated at high currents up to 1A without efficiency degradation. The typical spatial radiation pattern emits a uniform light lambertian distribution from -65° to 65° which can be easily fit for secondary optics. The correlated color temperature (CCT) has only 5% variation for daylight and less than 2% variation for warm white, when the junction temperature is increased from 25°C to 110°C, suggesting a stable CCT during operation for general lighting application. Coupled with aspheric lens and micro lens array in a wafer level process, it has almost the same light distribution intensity for special secondary optics lighting applications. In addition, the ul-tra-violet (UV) VLED, featuring a silicon substrate and hard glass cover, manufactured by wafer level pack-aging emits high power UV wavelengths appropriate for curing, currency, document verification, tanning, medical, and sterilization applications.

  20. Development of a monolithic, multi-MEMS microsystem on a chip demonstrating iMEMS{trademark} VLSI technology. R and D status report number 10, January 1--March 31, 1996

    SciTech Connect

    1996-04-17

    This quarter saw the first silicon from the iMEMS{reg_sign} test chip, with complete circuits and beam structures. The wafers looked fine cosmetically and the circuits functioned as designed, but the beams suffered an anomaly that the authors have never seen before. Diagnostic work is under way to sort out the root cause, and other wafers are coming out this quarter to see if it was a one-time anomaly. Work on the process-development front has slowed because of the construction of a dedicated fabrication line for the last-generation process. With the current robust market place for ADI`s business, the existing fabrication line has been operating at 100% capacity. On the device front, great progress has been made by both Berkeley and ADI in the area of gyroscopes. Measurements of close to a degree per second or better have been made for gyros of all three axes and of both single- (linear) and double- (rotary) axis devices. In addition, ADI has designed a gyro that can be packaged in air that very well might meet some of the low-precision needs. Accelerometers of several new formats have been designed and several have been implemented in silicon. First samples of the ADXL 181 designed especially for the fuzing, safe and arming application have been assembled and are in characterization by ADI and others. In addition, 2-axis, Z-axis and digital output designs have been demonstrated. A 3-axis micro-watt accelerometer has been designed and is in fabrication. A 2-axis design for tilt applications is also nearing silicon realization. This portfolio of linear accelerometers, and even angular versions of the same provide, an arsenal of capability for specialized needs as they arise in both commercial and military applications.

  1. Further investigation of EUV process sensitivities for wafer track processing

    NASA Astrophysics Data System (ADS)

    Bradon, Neil; Nafus, K.; Shite, H.; Kitano, J.; Kosugi, H.; Goethals, M.; Cheng, S.; Hermans, J.; Hendrickx, E.; Baudemprez, B.; Van Den Heuvel, D.

    2010-04-01

    As Extreme ultraviolet (EUV) lithography technology shows promising results below 40nm feature sizes, TOKYO ELECTRON LTD.(TEL) is committed to understanding the fundamentals needed to improve our technology, thereby enabling customers to meet roadmap expectations. TEL continues collaboration with imec for evaluation of Coater/Developer processing sensitivities using the ASML Alpha Demo Tool for EUV exposures. The results from the collaboration help develop the necessary hardware for EUV Coater/Developer processing. In previous work, processing sensitivities of the resist materials were investigated to determine the impact on critical dimension (CD) uniformity and defectivity. In this work, new promising resist materials have been studied and more information pertaining to EUV exposures was obtained. Specifically, post exposure bake (PEB) impact to CD is studied in addition to dissolution characteristics and resist material hydrophobicity. Additionally, initial results show the current status of CDU and defectivity with the ADT/CLEAN TRACK ACTTM 12 lithocluster. Analysis of a five wafer batch of CDU wafers shows within wafer and wafer to wafer contribution from track processing. A pareto of a patterned wafer defectivity test gives initial insight into the process defects with the current processing conditions. From analysis of these data, it's shown that while improvements in processing are certainly possible, the initial results indicate a manufacturable process for EUV.

  2. Wafer handling and placement tool

    DOEpatents

    Witherspoon, Linda L.

    1988-01-05

    A spring arm tool is provided for clamp engaging and supporting wafers while the tool is hand held. The tool includes a pair of relatively swingable jaw element supporting support arms and the jaw elements are notched to enjoy multiple point contact with a wafer peripheral portion. Also, one disclosed form of the tool includes remotely operable workpiece ejecting structure carried by the jaw elements thereof.

  3. Wafer Replacement Cluster Tool (Presentation);

    SciTech Connect

    Branz, H. M.

    2008-04-01

    This presentation on wafer replacement cluster tool discusses: (1) Platform for advanced R and D toward SAI 2015 cost goal--crystal silicon PV at area costs closer to amorphous Si PV, it's 15% efficiency, inexpensive substrate, and moderate temperature processing (<800 C); (2) Why silicon?--industrial and knowledge base, abundant and environmentally benign, market acceptance, and good efficiency; and (3) Why replace wafers?--expensive, high embedded energy content, and uses 50-100 times more silicon than needed.

  4. A bioinspired collision detection algorithm for VLSI implementation

    NASA Astrophysics Data System (ADS)

    Cuadri, J.; Linan, G.; Stafford, R.; Keil, M. S.; Roca, E.

    2005-06-01

    In this paper a bioinspired algorithm for collision detection is proposed, based on previous models of the locust (Locusta migratoria) visual system reported by F.C. Rind and her group, in the University of Newcastle-upon-Tyne. The algorithm is suitable for VLSI implementation in standard CMOS technologies as a system-on-chip for automotive applications. The working principle of the algorithm is to process a video stream that represents the current scenario, and to fire an alarm whenever an object approaches on a collision course. Moreover, it establishes a scale of warning states, from no danger to collision alarm, depending on the activity detected in the current scenario. In the worst case, the minimum time before collision at which the model fires the collision alarm is 40 msec (1 frame before, at 25 frames per second). Since the average time to successfully fire an airbag system is 2 msec, even in the worst case, this algorithm would be very helpful to more efficiently arm the airbag system, or even take some kind of collision avoidance countermeasures. Furthermore, two additional modules have been included: a "Topological Feature Estimator" and an "Attention Focusing Algorithm". The former takes into account the shape of the approaching object to decide whether it is a person, a road line or a car. This helps to take more adequate countermeasures and to filter false alarms. The latter centres the processing power into the most active zones of the input frame, thus saving memory and processing time resources.

  5. Design and implementation of highly parallel pipelined VLSI systems

    NASA Astrophysics Data System (ADS)

    Delange, Alphonsus Anthonius Jozef

    A methodology and its realization as a prototype CAD (Computer Aided Design) system for the design and analysis of complex multiprocessor systems is presented. The design is an iterative process in which the behavioral specifications of the system components are refined into structural descriptions consisting of interconnections and lower level components etc. A model for the representation and analysis of multiprocessor systems at several levels of abstraction and an implementation of a CAD system based on this model are described. A high level design language, an object oriented development kit for tool design, a design data management system, and design and analysis tools such as a high level simulator and graphics design interface which are integrated into the prototype system and graphics interface are described. Procedures for the synthesis of semiregular processor arrays, and to compute the switching of input/output signals, memory management and control of processor array, and sequencing and segmentation of input/output data streams due to partitioning and clustering of the processor array during the subsequent synthesis steps, are described. The architecture and control of a parallel system is designed and each component mapped to a module or module generator in a symbolic layout library, compacted for design rules of VLSI (Very Large Scale Integration) technology. An example of the design of a processor that is a useful building block for highly parallel pipelined systems in the signal/image processing domains is given.

  6. Time memory cell VLSI for the PHENIX drift chamber

    SciTech Connect

    Arai, Y.; Ikeno, M.; Sagara, M.; Emura, T.

    1998-06-01

    A high-precision Time-to-Digital-Converter VLSI, TMC-PHX1, was developed for the PHENIX drift chamber. The chip contains 4 channels of TDC with two stages of data buffering and one level of trigger buffering required in very high rate experiments. In addition to a fixed data size readout, the chip also supports a zero-suppression mode readout. The chip records both rising and falling edge timings, and has a least timing count of 0.83 ns/bit and 1.66 ns/bit respectively. A level 1 buffer has a recording depth of 6.8 {micro}sec and a readout FIFO has a depth of 128 words. High precision timing was derived from an asymmetric ring oscillator stabilized with a PLL. The chip runs at 4 times faster clock (37.6 MHz) of the RHIC bunch clock, and was fabricated with 0.5 {micro}m CMOS gate-array technology.

  7. A new method of VLSI conform design for MOS cells

    NASA Astrophysics Data System (ADS)

    Schmidt, K. H.; Wach, W.; Mueller-Glaser, K. D.

    An automated method for the design of specialized SSI/LSI-level MOS cells suitable for incorporation in VLSI chips is described. The method uses the symbolic-layout features of the CABBAGE computer program (Hsueh, 1979; De Man et al., 1982), but restricted by a fixed grid system to facilitate compaction procedures. The techniques used are shown to significantly speed the processes of electrical design, layout, design verification, and description for subsequent CAD/CAM application. In the example presented, a 211-transistor, parallel-load, synchronous 4-bit up/down binary counter cell was designed in 9 days, as compared to 30 days for a manually-optimized-layout version and 3 days for a larger, less efficient cell designed by a programmable logic array; the cell areas were 0.36, 0.21, and 0.79 sq mm, respectively. The primary advantage of the method is seen in the extreme ease with which the cell design can be adapted to new parameters or design rules imposed by improvements in technology.

  8. A VLSI architecture for high performance CABAC encoding

    NASA Astrophysics Data System (ADS)

    Shojania, Hassan; Sudharsanan, Subramania

    2005-07-01

    One key technique for improving the coding e+/-ciency of H.264 video standard is the entropy coder, context- adaptive binary arithmetic coder (CABAC). However the complexity of the encoding process of CABAC is signicantly higher than the table driven entropy encoding schemes such as the Hu®man coding. CABAC is also bit serial and its multi-bit parallelization is extremely di+/-cult. For a high denition video encoder, multi-giga hertz RISC processors will be needed to implement the CABAC encoder. In this paper, we provide an e+/-cient, pipelined VLSI architecture for CABAC encoding along with an analysis of critical issues. The solution encodes a binary symbol every cycle. An FPGA implementation of the proposed scheme capable of 104 Mbps encoding rate and test results are presented. An ASIC synthesis and simulation for a 0.18 ¹m process technology indicates that the design is capable of encoding 190 million binary symbols per second using an area of 0.35 mm2. ¤

  9. A hierarchical approach to test generation for CMOS VLSI circuits

    NASA Astrophysics Data System (ADS)

    Weening, Edward Christiaan

    A hierarchical approach to the automatic test pattern generation for large digital VLSI circuits, fabricated in CMOS technology, is developed and implemented. The use of information on the circuit's hierarchy, which is readily available from most modern CAD (Computer Aided Design) systems, speeds up the test generation process considerably and enhances the quality of the tests generated. The hierarchical test generation tool can also be integrated in future CAD systems making test generation and testability enhancement during circuit design feasible. The hierarchical approach is described at the switch, functional, and behavioral level. A test pattern generation algorithm at the switch level is presented. Test generation and fault simulation algorithms both using OBDD (Ordered Binary Decision Diagram) functional descriptions of the circuit modules are presented. A test plan generation method at the behavioral level is presented. Practical results show that the hierarchical approach to test generation is more efficient than a conventional, non-hierarchical approach, especially for switch level faults. The results also show that the use of Design For Testability (DFT) circuitry is supported at the behavioral level.

  10. Note: Near infrared interferometric silicon wafer metrology

    NASA Astrophysics Data System (ADS)

    Choi, M. S.; Park, H. M.; Joo, K. N.

    2016-04-01

    In this investigation, two near infrared (NIR) interferometric techniques for silicon wafer metrology are described and verified with experimental results. Based on the transparent characteristic of NIR light to a silicon wafer, the fiber based spectrally resolved interferometry can measure the optical thickness of the wafer and stitching low coherence scanning interferometry can reconstruct entire surfaces of the wafer.

  11. Wafer level test solutions for IR sensors

    NASA Astrophysics Data System (ADS)

    Giessmann, Sebastian; Werner, Frank-Michael

    2014-05-01

    Wafer probers provide an established platform for performing electrical measurements at wafer level for CMOS and similar process technologies. For testing IR sensors, the requirements are beyond the standard prober capabilities. This presentation will give an overview about state of the art IR sensor probing systems reaching from flexible engineering solutions to automated production needs. Cooled sensors typically need to be tested at a target temperature below 80 K. Not only is the device temperature important but also the surrounding environment is required to prevent background radiation from reaching the device under test. To achieve that, a cryogenic shield is protecting the movable chuck. By operating that shield to attract residual gases inside the chamber, a completely contamination-free test environment can be guaranteed. The use of special black coatings are furthermore supporting the removal of stray light. Typically, probe card needles are operating at ambient (room) temperature when connecting to the wafer. To avoid the entrance of heat, which can result in distorted measurements, the probe card is fully embedded into the cryogenic shield. A shutter system, located above the probe field, is designed to switch between the microscope view to align the sensor under the needles and the test relevant setup. This includes a completely closed position to take dark current measurements. Another position holds a possible filter glass with the required aperture opening. The necessary infrared sources to stimulate the device are located above.

  12. Wafer plane inspection with soft resist thresholding

    NASA Astrophysics Data System (ADS)

    Hess, Carl; Shi, Rui-fang; Wihl, Mark; Xiong, Yalin; Pang, Song

    2008-10-01

    Wafer Plane Inspection (WPI) is an inspection mode on the KLA-Tencor TeraScaTM platform that uses the high signalto- noise ratio images from the high numerical aperture microscope, and then models the entire lithographic process to enable defect detection on the wafer plane[1]. This technology meets the needs of some advanced mask manufacturers to identify the lithographically-significant defects while ignoring the other non-lithographically-significant defects. WPI accomplishes this goal by performing defect detection based on a modeled image of how the mask features would actually print in the photoresist. There are several advantages to this approach: (1) the high fidelity of the images provide a sensitivity advantage over competing approaches; (2) the ability to perform defect detection on the wafer plane allows one to only see those defects that have a printing impact on the wafer; (3) the use of modeling on the lithographic portion of the flow enables unprecedented flexibility to support arbitrary illumination profiles, process-window inspection in unit time, and combination modes to find both printing and non-printing defects. WPI is proving to be a valuable addition to the KLA-Tencor detection algorithm suite. The modeling portion of WPI uses a single resist threshold as the final step in the processing. This has been shown to be adequate on several advanced customer layers, but is not ideal for all layers. Actual resist chemistry has complicated processes including acid and base-diffusion and quench that are not consistently well-modeled with a single resist threshold. We have considered the use of an advanced resist model for WPI, but rejected it because the burdensome requirements for the calibration of the model were not practical for reticle inspection. This paper describes an alternative approach that allows for a "soft" resist threshold to be applied that provides a more robust solution for the most challenging processes. This approach is just

  13. A new VLSI complex integer multiplier which uses a quadratic-polynomial residue system with Fermat numbers

    NASA Technical Reports Server (NTRS)

    Shyu, H. C.; Reed, I. S.; Truong, T. K.; Hsu, I. S.; Chang, J. J.

    1987-01-01

    A quadratic-polynomial Fermat residue number system (QFNS) has been used to compute complex integer multiplications. The advantage of such a QFNS is that a complex integer multiplication requires only two integer multiplications. In this article, a new type Fermat number multiplier is developed which eliminates the initialization condition of the previous method. It is shown that the new complex multiplier can be implemented on a single VLSI chip. Such a chip is designed and fabricated in CMOS-Pw technology.

  14. A single VLSI chip for computing syndromes in the (225, 223) Reed-Solomon decoder

    NASA Astrophysics Data System (ADS)

    Hsu, I. S.; Truong, T. K.; Shao, H. M.; Deutsch, L. J.

    1986-11-01

    A description of a single VLSI chip for computing syndromes in the (255, 223) Reed-Solomon decoder is presented. The architecture that leads to this single VLSI chip design makes use of the dual basis multiplication algorithm. The same architecture can be applied to design VLSI chips to compute various kinds of number theoretic transforms.

  15. A single VLSI chip for computing syndromes in the (225, 223) Reed-Solomon decoder

    NASA Technical Reports Server (NTRS)

    Hsu, I. S.; Truong, T. K.; Shao, H. M.; Deutsch, L. J.

    1986-01-01

    A description of a single VLSI chip for computing syndromes in the (255, 223) Reed-Solomon decoder is presented. The architecture that leads to this single VLSI chip design makes use of the dual basis multiplication algorithm. The same architecture can be applied to design VLSI chips to compute various kinds of number theoretic transforms.

  16. IGBT scaling principle toward CMOS compatible wafer processes

    NASA Astrophysics Data System (ADS)

    Tanaka, Masahiro; Omura, Ichiro

    2013-02-01

    A scaling principle for trench gate IGBT is proposed. CMOS technology on large diameter wafer enables to produce various digital circuits with higher performance and lower cost. The transistor cell structure becomes laterally smaller and smaller and vertically shallower and shallower. In contrast, latest IGBTs have rather deeper trench structure to obtain lower on-state voltage drop and turn-off loss. In the aspect of the process uniformity and wafer warpage, manufacturing such structure in the CMOS factory is difficult. In this paper, we show the scaling principle toward shallower structure and better performance. The principle is theoretically explained by our previously proposed "Structure Oriented" analytical model. The principle represents a possibility of technology direction and roadmap for future IGBT for improving the device performance consistent with lower cost and high volume productivity with CMOS compatible large diameter wafer technologies.

  17. Low-frequency noise reduction in vertical MOSFETs having tunable threshold voltage fabricated with 60 nm CMOS technology on 300 mm wafer process

    NASA Astrophysics Data System (ADS)

    Imamoto, Takuya; Ma, Yitao; Muraguchi, Masakazu; Endoh, Tetsuo

    2015-04-01

    In this paper, DC and low-frequency noise (LFN) characteristics have been investigated with actual measurement data in both n- and p-type vertical MOSFETs (V-MOSFETs) for the first time. The V-MOSFETs which was fabricated on 300 mm bulk silicon wafer process have realized excellent DC performance and a significant reduction of flicker (1/f) noise. The measurement results show that the fabricated V-MOSFETs with 60 nm silicon pillar and 100 nm gate length achieve excellent steep sub-threshold swing (69 mV/decade for n-type and 66 mV/decade for p-type), good on-current (281 µA/µm for n-type 149 µA/µm for p-type), low off-leakage current (28.1 pA/µm for n-type and 79.6 pA/µm for p-type), and excellent on-off ratio (1 × 107 for n-type and 2 × 106 for p-type). In addition, it is demonstrated that our fabricated V-MOSFETs can control the threshold voltage (Vth) by changing the channel doping condition, which is the useful and low-cost technique as it has been widely used in the conventional bulk planar MOSFET. This result indicates that V-MOSFETs can control Vth more finely and flexibly by the combined the use of the doping technique with other techniques such as work function engineering of metal-gate. Moreover, it is also shown that V-MOSFETs can suppress 1/f noise (L\\text{gate}WS\\text{Id}/I\\text{d}2 of 10-13-10-11 µm2/Hz for n-type and 10-12-10-10 µm2/Hz for p-type) to one or two order lower level than previously reported nanowire type MOSFET, FinFET, Tri-Gate, and planar MOSFETs. The results have also proved that both DC and 1/f noise performances are independent from the bias voltage which is applied to substrate or well layer. Therefore, it is verified that V-MOSFETs can eliminate the effects from substrate or well layer, which always adversely affects the circuit performances due to this serial connection.

  18. Investigation of optimized wafer sampling with multiple integrated metrology modules within photolithography equipment

    NASA Astrophysics Data System (ADS)

    Taylor, Ted L.; Makimura, Eri

    2007-03-01

    Micron Technology, Inc., explores the challenges of defining specific wafer sampling scenarios for users of multiple integrated metrology modules within a Tokyo Electron Limited (TEL) CLEAN TRACK TM LITHIUS TM. With the introduction of integrated metrology (IM) into the photolithography coater/developer, users are faced with the challenge of determining what type of data is required to collect to adequately monitor the photolithography tools and the manufacturing process. Photolithography coaters/developers have a metrology block that is capable of integrating three metrology modules into the standard wafer flow. Taking into account the complexity of multiple metrology modules and varying across-wafer sampling plans per metrology module, users must optimize the module wafer sampling to obtain their desired goals. Users must also understand the complexity of the coater/developer handling systems to deliver wafers to each module. Coater/developer systems typically process wafers sequentially through each module to ensure consistent processing. In these systems, the first wafer must process through a module before the next wafer can process through a module, and the first wafer must return to the cassette before the second wafer can return to the cassette. IM modules within this type of system can reduce throughput and limit flexible wafer selections. Finally, users must have the ability to select specific wafer samplings for each IM module. This case study explores how to optimize wafer sampling plans and how to identify limitations with the complexity of multiple integrated modules to ensure maximum metrology throughput without impact to the productivity of processing wafers through the photolithography cell (litho cell).

  19. Thermomechanical global response of the EUVL wafer during exposure

    NASA Astrophysics Data System (ADS)

    Chang, Jaehyuk; Martin, Carl J.; Engelstad, Roxann L.; Lovell, Edward G.

    2002-07-01

    Extreme ultraviolet lithography (EUVL) is one of the leading technologies for Next-Generation Lithography. Continued progress in its development will be facilitated by characterizing all sources of distortion in the chip fabrication process. These include the thermal distortions of the wafer caused by deposited EUVL energy during scanning exposure. Absorbed energy from the beam produces temperature increases and structural displacements in the wafer, which directly contribute to pattern placement errors and image blur. Because of the vacuum conditions of EUVL systems, wafer chucking will be electrostatic, which has a number of advantages over mechanical clamping systems. The goals of this research are to predict the transient temperature increases and corresponding displacements (locally and globally) consistent with the thermomechanical boundary conditions of the wafer. Both thermal and structural finite element models were constructed to numerically simulate wafer exposure. The response of the wafer is relatively sensitive to the interface conditions between the substrate and electrostatic chuck. Thus, parametric studies of the response to changes in the contact conductance and the friction coefficient were performed and are presented in this paper.

  20. Performance optimization of digital VLSI circuits

    SciTech Connect

    Marple, D.P.

    1987-01-01

    Designers of digital VLSI circuits have virtually no computer tools available for the optimization of circuit performance. Instead, a designer relies extensively on circuit-analysis tools, such as circuit simulation (SPICE) and/or critical-delay-path analysis. A circuit-analysis approach to digital design is very labor-intensive and seldom produces a circuit with optimum area/delay or power/delay trade off. The goal of this research is to provide a synthesis approach to the design of digital circuits by finding the sizes of transistors that optimize circuits by finding the sizes of transistors that optimize circuit performance (delay, area, power). Solutions are found that are optimum for all possible delay paths of a given circuit and not for just a single path. The approach of this research is to formulate the problem of area/delay or power/delay optimization as a nonlinear program. Conditions for optimality are then established using graph theory and Kuhn-Tucker conditions. Finally, the use of augmented-Lagrangian and projected-Lagrangian algorithms are reviewed for the solution of the nonlinear programs. Two computer programs, PLATO and COP, were developed by the author to optimize CMOS PLA's (PLATO) and general CMOS circuits (COP). These tools provably find the globally optimum transistor sizes for a given circuit. Results are presented for PLA's and small- to medium-sized cells.

  1. Characterization of inorganic resist for VLSI fabrication

    SciTech Connect

    Leung, W.

    1985-01-01

    This dissertation concentrates on the study of the image formation mechanisms of the Ge/sub 0.1/Se/sub 0.9/ resist and the assessment of the resist for VLSI fabrication. A laboratory Ge/sub 0.1/Se/sub 0.9/ resist process was established. A simulation program for the exposure model of the resist was written and incorporated into the SAMPLE program. The model describes the Ag transport mechanisms in the resist system which are the lateral diffusion and photobleaching of Ag in the Ag/sub 2/Se layer and the vertical photodoping of Ag from the Ag/sub 2/Se to the Ge/sub 0.1/Se/sub 0.9/ layer. Laboratory experiment and computer simulation has been used to study the four exposure phenomena: edge sharpening, contrast enhancement, feature-dependent amplification and feature-dependent photodoping suppression. The phenomena result from the photobleaching and lateral diffusion mechanisms which occur in the sensitized layer of the resist system during the exposure process. The conditions under which these phenomena occur was identified. Their practical impact on the resolution capability of the resist has been evaluated. For normal exposures (<150mJ/cm/sup 2/), these phenomena do not occur. The mechanism of Ag photodoping Ge/sub 0.1/Se/sub 0.9/ glass was studied. The photodoping was found to obey Fick's diffusion law.

  2. Development of Megasonic cleaning for silicon wafers. Final report

    SciTech Connect

    Mayer, A.

    1980-09-01

    The major goals to develop a cleaning and drying system for processing at least 2500 three-in.-diameter wafers per hour and to reduce the process cost were achieved. The new system consists of an ammonia-hydrogen peroxide bath in which both surfaces of 3/32-in.-spaced, ion-implanted wafers are cleaned in quartz carriers moved on a belt past two pairs of Megasonic transducers. The wafers are dried in the novel room-temperature, high-velocity air dryer in the same carriers used for annealing. A new laser scanner was used effectively to monitor the cleaning ability on a sampling basis. The following factors contribute to the improved effectiveness of the process: (1) recirculation and filtration of the cleaning solution permit it to be used for at least 100,000 wafers with only a relatively small amount of chemical make-up before discarding; (2) uniform cleanliness is achieved because both sides of the wafer are Megasonically scrubbed to remove particulate impurities; (3) the novel dryer permits wafers to be dried in a high-velocity room-temperature air stream on a moving belt in their quartz carriers; and (4) the personnel safety of such a system is excellent and waste disposal has no adverse ecological impact. With the addition of mechanical transfer arms, two systems like the one developed will produce enough cleaned wafers for a 30-MW/year production facility. A projected scale-up well within the existing technology would permit a system to be assembled that produces about 12,745 wafers per hour; about 11 such systems, each occupying about 110 square feet, would be needed for each cleaning stage of a 500-MW/year production facility.

  3. Wafer sampling by regression for systematic wafer variation detection

    NASA Astrophysics Data System (ADS)

    Moon, Byungsool; McNames, James; Whitefield, Bruce; Rudolph, Paul; Zola, Jeff

    2005-05-01

    In-line measurements are used to monitor semiconductor manufacturing processes for excessive variation using statistical process control (SPC) chart techniques. Systematic spatial wafer variation often occurs in a recognizable pattern across the wafer that is characteristic of a particular manufacturing step. Visualization tools are used to associate these patterns with specific manufacturing steps preceding the measurement. Acquiring the measurements is an expensive and slow process. The number of sites measured on a wafer must be minimized while still providing sufficient data to monitor the process. We address two key challenges to effective wafer-level monitoring. The first challenge is to select a small sample of inspection sites that maximize detection sensitivity to the patterns of interest, while minimizing the confounding effects of other types of wafer variation. The second challenge is to develop a detection algorithm that maximizes sensitivity to the patterns of interest without exceeding a user-specified false positive rate. We propose new sampling and detection methods. Both methods are based on a linear regression model with distinct and orthogonal components. The model is flexible enough to include many types of systematic spatial variation across the wafer. Because the components are orthogonal, the degree of each type of variation can be estimated and detected independently with very few samples. A formal hypothesis test can then be used to determine whether specific patterns are present. This approach enables one to determine the sensitivity of a sample plan to patterns of interest and the minimum number of measurements necessary to adequately monitor the process.

  4. On testing VLSI chips for the big Viterbi decoder

    NASA Technical Reports Server (NTRS)

    Hsu, I. S.

    1989-01-01

    A general technique that can be used in testing very large scale integrated (VLSI) chips for the Big Viterbi Decoder (BVD) system is described. The test technique is divided into functional testing and fault-coverage testing. The purpose of functional testing is to verify that the design works functionally. Functional test vectors are converted from outputs of software simulations which simulate the BVD functionally. Fault-coverage testing is used to detect and, in some cases, to locate faulty components caused by bad fabrication. This type of testing is useful in screening out bad chips. Finally, design for testability, which is included in the BVD VLSI chip design, is described in considerable detail. Both the observability and controllability of a VLSI chip are greatly enhanced by including the design for the testability feature.

  5. Heating device for semiconductor wafers

    DOEpatents

    Vosen, Steven R.

    1999-01-01

    An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the light energy sources are positioned such that many different radial heating zones are created on a wafer being heated. For instance, in one embodiment, the light energy sources form a spiral configuration. In an alternative embodiment, the light energy sources appear to be randomly dispersed with respect to each other so that no discernable pattern is present. In a third alternative embodiment of the present invention, the light energy sources form concentric rings. Tuning light sources are then placed in between the concentric rings of light.

  6. Heating device for semiconductor wafers

    DOEpatents

    Vosen, S.R.

    1999-07-27

    An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the light energy sources are positioned such that many different radial heating zones are created on a wafer being heated. For instance, in one embodiment, the light energy sources form a spiral configuration. In an alternative embodiment, the light energy sources appear to be randomly dispersed with respect to each other so that no discernible pattern is present. In a third alternative embodiment of the present invention, the light energy sources form concentric rings. Tuning light sources are then placed in between the concentric rings of light. 4 figs.

  7. A single chip VLSI Reed-Solomon decoder

    NASA Astrophysics Data System (ADS)

    Shao, H. M.; Truong, T. K.; Hsu, I. S.; Deutsch, L. J.; Reed, I. S.

    1986-02-01

    A new VLSI design of a pipeline Reed-Solomon decoder is presented. The transform decoding technique used in a previous design is replaced by a time domain algorithm. A new architecture that implements such an algorithm permits efficient pipeline processing with minimum circuitry. A systolic array is also developed to perform erasure corrections in the new design. A modified form of Euclid's algorithm is implemented by a new architecture that maintains the throughput rate with less circuitry. Such improvements result in both enhanced capability and a significant reduction in silicon area, therefore making it possible to build a pipeline (31,15)RS decoder on a single VLSI chip.

  8. A radial basis function neurocomputer implemented with analog VLSI circuits

    NASA Technical Reports Server (NTRS)

    Watkins, Steven S.; Chau, Paul M.; Tawel, Raoul

    1992-01-01

    An electronic neurocomputer which implements a radial basis function neural network (RBFNN) is described. The RBFNN is a network that utilizes a radial basis function as the transfer function. The key advantages of RBFNNs over existing neural network architectures include reduced learning time and the ease of VLSI implementation. This neurocomputer is based on an analog/digital hybrid design and has been constructed with both custom analog VLSI circuits and a commercially available digital signal processor. The hybrid architecture is selected because it offers high computational performance while compensating for analog inaccuracies, and it features the ability to model large problems.

  9. A single chip VLSI Reed-Solomon decoder

    NASA Technical Reports Server (NTRS)

    Shao, H. M.; Truong, T. K.; Hsu, I. S.; Deutsch, L. J.; Reed, I. S.

    1986-01-01

    A new VLSI design of a pipeline Reed-Solomon decoder is presented. The transform decoding technique used in a previous design is replaced by a time domain algorithm. A new architecture that implements such an algorithm permits efficient pipeline processing with minimum circuitry. A systolic array is also developed to perform erasure corrections in the new design. A modified form of Euclid's algorithm is implemented by a new architecture that maintains the throughput rate with less circuitry. Such improvements result in both enhanced capability and a significant reduction in silicon area, therefore making it possible to build a pipeline (31,15)RS decoder on a single VLSI chip.

  10. NASA Space Engineering Research Center for VLSI systems design

    NASA Technical Reports Server (NTRS)

    1991-01-01

    This annual review reports the center's activities and findings on very large scale integration (VLSI) systems design for 1990, including project status, financial support, publications, the NASA Space Engineering Research Center (SERC) Symposium on VLSI Design, research results, and outreach programs. Processor chips completed or under development are listed. Research results summarized include a design technique to harden complementary metal oxide semiconductors (CMOS) memory circuits against single event upset (SEU); improved circuit design procedures; and advances in computer aided design (CAD), communications, computer architectures, and reliability design. Also described is a high school teacher program that exposes teachers to the fundamentals of digital logic design.

  11. Architecture for VLSI design of Reed-Solomon encoders

    NASA Technical Reports Server (NTRS)

    Liu, K. Y.

    1982-01-01

    A description is given of the logic structure of the universal VLSI symbol-slice Reed-Solomon (RS) encoder chip, from a group of which an RS encoder may be constructed through cascading and proper interconnection. As a design example, it is shown that an RS encoder presently requiring approximately 40 discrete CMOS ICs may be replaced by an RS encoder consisting of four identical, interconnected VLSI RS encoder chips, offering in addition to greater compactness both a lower power requirement and greater reliability.

  12. Graphitized silicon carbide microbeams: wafer-level, self-aligned graphene on silicon wafers

    NASA Astrophysics Data System (ADS)

    Cunning, Benjamin V.; Ahmed, Mohsin; Mishra, Neeraj; Ranjbar Kermany, Atieh; Wood, Barry; Iacopi, Francesca

    2014-08-01

    Currently proven methods that are used to obtain devices with high-quality graphene on silicon wafers involve the transfer of graphene flakes from a growth substrate, resulting in fundamental limitations for large-scale device fabrication. Moreover, the complex three-dimensional structures of interest for microelectromechanical and nanoelectromechanical systems are hardly compatible with such transfer processes. Here, we introduce a methodology for obtaining thousands of microbeams, made of graphitized silicon carbide on silicon, through a site-selective and wafer-scale approach. A Ni-Cu alloy catalyst mediates a self-aligned graphitization on prepatterned SiC microstructures at a temperature that is compatible with silicon technologies. The graphene nanocoating leads to a dramatically enhanced electrical conductivity, which elevates this approach to an ideal method for the replacement of conductive metal films in silicon carbide-based MEMS and NEMS devices.

  13. Graphitized silicon carbide microbeams: wafer-level, self-aligned graphene on silicon wafers.

    PubMed

    Cunning, Benjamin V; Ahmed, Mohsin; Mishra, Neeraj; Kermany, Atieh Ranjbar; Wood, Barry; Iacopi, Francesca

    2014-08-15

    Currently proven methods that are used to obtain devices with high-quality graphene on silicon wafers involve the transfer of graphene flakes from a growth substrate, resulting in fundamental limitations for large-scale device fabrication. Moreover, the complex three-dimensional structures of interest for microelectromechanical and nanoelectromechanical systems are hardly compatible with such transfer processes. Here, we introduce a methodology for obtaining thousands of microbeams, made of graphitized silicon carbide on silicon, through a site-selective and wafer-scale approach. A Ni-Cu alloy catalyst mediates a self-aligned graphitization on prepatterned SiC microstructures at a temperature that is compatible with silicon technologies. The graphene nanocoating leads to a dramatically enhanced electrical conductivity, which elevates this approach to an ideal method for the replacement of conductive metal films in silicon carbide-based MEMS and NEMS devices. PMID:25053702

  14. High performance VLSI telemetry data systems

    NASA Technical Reports Server (NTRS)

    Chesney, J.; Speciale, N.; Horner, W.; Sabia, S.

    1990-01-01

    NASA's deployment of major space complexes such as Space Station Freedom (SSF) and the Earth Observing System (EOS) will demand increased functionality and performance from ground based telemetry acquisition systems well above current system capabilities. Adaptation of space telemetry data transport and processing standards such as those specified by the Consultative Committee for Space Data Systems (CCSDS) standards and those required for commercial ground distribution of telemetry data, will drive these functional and performance requirements. In addition, budget limitations will force the requirement for higher modularity, flexibility, and interchangeability at lower cost in new ground telemetry data system elements. At NASA's Goddard Space Flight Center (GSFC), the design and development of generic ground telemetry data system elements, over the last five years, has resulted in significant solutions to these problems. This solution, referred to as the functional components approach includes both hardware and software components ready for end user application. The hardware functional components consist of modern data flow architectures utilizing Application Specific Integrated Circuits (ASIC's) developed specifically to support NASA's telemetry data systems needs and designed to meet a range of data rate requirements up to 300 Mbps. Real-time operating system software components support both embedded local software intelligence, and overall system control, status, processing, and interface requirements. These components, hardware and software, form the superstructure upon which project specific elements are added to complete a telemetry ground data system installation. This paper describes the functional components approach, some specific component examples, and a project example of the evolution from VLSI component, to basic board level functional component, to integrated telemetry data system.

  15. Silicon wafer-based tandem cells: The ultimate photovoltaic solution?

    NASA Astrophysics Data System (ADS)

    Green, Martin A.

    2014-03-01

    Recent large price reductions with wafer-based cells have increased the difficulty of dislodging silicon solar cell technology from its dominant market position. With market leaders expected to be manufacturing modules above 16% efficiency at 0.36/Watt by 2017, even the cost per unit area (60-70/m2) will be difficult for any thin-film photovoltaic technology to significantly undercut. This may make dislodgement likely only by appreciably higher energy conversion efficiency approaches. A silicon wafer-based cell able to capitalize on on-going cost reductions within the mainstream industry, but with an appreciably higher than present efficiency, might therefore provide the ultimate PV solution. With average selling prices of 156 mm quasi-square monocrystalline Si photovoltaic wafers recently approaching 1 (per wafer), wafers now provide clean, low cost templates for overgrowth of thin, wider bandgap high performance cells, nearly doubling silicon's ultimate efficiency potential. The range of possible Si-based tandem approaches is reviewed together with recent results and ultimate prospects.

  16. Allowable silicon wafer thickness versus diameter for ingot rotation ID wafering

    NASA Technical Reports Server (NTRS)

    Chen, C. P.; Leipold, M. H.

    1982-01-01

    Inner diameter (ID) wafering of ingot rotation reduce the ID saw blade diameter was investigated. The blade thickness can be reduced, resulting in minimal kerf loss. However, significant breakage of wafers occurs during the rotation wafering as the wafer thickness decreases. Fracture mechanics was used to develop an equation relating wafer thickness, diameter and fracture behavior at the point of fracture by using a model of a wafer, supported by a center column and subjected to a cantilever force. It is indicated that the minimum allowable wafer thickness does not increase appreciably with increasing wafer diameter and that fracture through the thickness rather than through the center supporting column limits the minimum allowable wafer thickness. It is suggested that the minimum allowable wafer thickness can be reduced by using a vacuum chuck on the wafer surface to enhance cleavage fracture of the center core and by using 111 ingots.

  17. Wafer-scale Mitochondrial Membrane Potential Assays

    PubMed Central

    Lim, Tae-Sun; Davila, Antonio; Zand, Katayoun; Douglas, Wallace C.; Burke, Peter J.

    2012-01-01

    It has been reported that mitochondrial metabolic and biophysical parameters are associated with degenerative diseases and the aging process. To evaluate these biochemical parameters, current technology requires several hundred milligrams of isolated mitochondria for functional assays. Here, we demonstrate manufacturable wafer-scale mitochondrial functional assay lab-on-a-chip devices, which require mitochondrial protein quantities three orders of magnitude less than current assays, integrated onto 4” standard silicon wafer with new fabrication processes and materials. Membrane potential changes of isolated mitochondria from various well-established cell lines such as human HeLa cell line (Heb7A), human osteosarcoma cell line (143b) and mouse skeletal muscle tissue were investigated and compared. This second generation integrated lab-on-a-chip system developed here shows enhanced structural durability and reproducibility while increasing the sensitivity to changes in mitochondrial membrane potential by an order of magnitude as compared to first generation technologies. We envision this system to be a great candidate to substitute current mitochondrial assay systems. PMID:22627274

  18. A special purpose silicon compiler for designing supercomputing VLSI systems

    NASA Technical Reports Server (NTRS)

    Venkateswaran, N.; Murugavel, P.; Kamakoti, V.; Shankarraman, M. J.; Rangarajan, S.; Mallikarjun, M.; Karthikeyan, B.; Prabhakar, T. S.; Satish, V.; Venkatasubramaniam, P. R.

    1991-01-01

    Design of general/special purpose supercomputing VLSI systems for numeric algorithm execution involves tackling two important aspects, namely their computational and communication complexities. Development of software tools for designing such systems itself becomes complex. Hence a novel design methodology has to be developed. For designing such complex systems a special purpose silicon compiler is needed in which: the computational and communicational structures of different numeric algorithms should be taken into account to simplify the silicon compiler design, the approach is macrocell based, and the software tools at different levels (algorithm down to the VLSI circuit layout) should get integrated. In this paper a special purpose silicon (SPS) compiler based on PACUBE macrocell VLSI arrays for designing supercomputing VLSI systems is presented. It is shown that turn-around time and silicon real estate get reduced over the silicon compilers based on PLA's, SLA's, and gate arrays. The first two silicon compiler characteristics mentioned above enable the SPS compiler to perform systolic mapping (at the macrocell level) of algorithms whose computational structures are of GIPOP (generalized inner product outer product) form. Direct systolic mapping on PLA's, SLA's, and gate arrays is very difficult as they are micro-cell based. A novel GIPOP processor is under development using this special purpose silicon compiler.

  19. An Interactive Multimedia Learning Environment for VLSI Built with COSMOS

    ERIC Educational Resources Information Center

    Angelides, Marios C.; Agius, Harry W.

    2002-01-01

    This paper presents Bigger Bits, an interactive multimedia learning environment that teaches students about VLSI within the context of computer electronics. The system was built with COSMOS (Content Oriented semantic Modelling Overlay Scheme), which is a modelling scheme that we developed for enabling the semantic content of multimedia to be used…

  20. CMOS VLSI Layout and Verification of a SIMD Computer

    NASA Technical Reports Server (NTRS)

    Zheng, Jianqing

    1996-01-01

    A CMOS VLSI layout and verification of a 3 x 3 processor parallel computer has been completed. The layout was done using the MAGIC tool and the verification using HSPICE. Suggestions for expanding the computer into a million processor network are presented. Many problems that might be encountered when implementing a massively parallel computer are discussed.

  1. Hybrid VLSI/QCA Architecture for Computing FFTs

    NASA Technical Reports Server (NTRS)

    Fijany, Amir; Toomarian, Nikzad; Modarres, Katayoon; Spotnitz, Matthew

    2003-01-01

    A data-processor architecture that would incorporate elements of both conventional very-large-scale integrated (VLSI) circuitry and quantum-dot cellular automata (QCA) has been proposed to enable the highly parallel and systolic computation of fast Fourier transforms (FFTs). The proposed circuit would complement the QCA-based circuits described in several prior NASA Tech Briefs articles, namely Implementing Permutation Matrices by Use of Quantum Dots (NPO-20801), Vol. 25, No. 10 (October 2001), page 42; Compact Interconnection Networks Based on Quantum Dots (NPO-20855) Vol. 27, No. 1 (January 2003), page 32; and Bit-Serial Adder Based on Quantum Dots (NPO-20869), Vol. 27, No. 1 (January 2003), page 35. The cited prior articles described the limitations of very-large-scale integrated (VLSI) circuitry and the major potential advantage afforded by QCA. To recapitulate: In a VLSI circuit, signal paths that are required not to interact with each other must not cross in the same plane. In contrast, for reasons too complex to describe in the limited space available for this article, suitably designed and operated QCAbased signal paths that are required not to interact with each other can nevertheless be allowed to cross each other in the same plane without adverse effect. In principle, this characteristic could be exploited to design compact, coplanar, simple (relative to VLSI) QCA-based networks to implement complex, advanced interconnection schemes.

  2. Single-Chip VLSI Reed-Solomon Decoder

    NASA Technical Reports Server (NTRS)

    Shao, Howard M.; Truong, Trieu-Kie; Hsu, In-Shek; Deutsch, Leslie J.

    1988-01-01

    Efficient utilization of computing elements reduces size while preserving throughput. VLSI architecture is pipeline Reed-Solomon decoder for correction of errors and erasures. Uses transform circuit to compute syndrome polynomial. Erasure information enters decoder as binary sequence. Applied to variety of digital communications involving error-correcting RS codes.

  3. 450mm wafer patterning with jet and flash imprint lithography

    NASA Astrophysics Data System (ADS)

    Thompson, Ecron; Hellebrekers, Paul; Hofemann, Paul; LaBrake, Dwayne L.; Resnick, Douglas J.; Sreenivasan, S. V.

    2013-09-01

    The next step in the evolution of wafer size is 450mm. Any transition in sizing is an enormous task that must account for fabrication space, environmental health and safety concerns, wafer standards, metrology capability, individual process module development and device integration. For 450mm, an aggressive goal of 2018 has been set, with pilot line operation as early as 2016. To address these goals, consortiums have been formed to establish the infrastructure necessary to the transition, with a focus on the development of both process and metrology tools. Central to any process module development, which includes deposition, etch and chemical mechanical polishing is the lithography tool. In order to address the need for early learning and advance process module development, Molecular Imprints Inc. has provided the industry with the first advanced lithography platform, the Imprio® 450, capable of patterning a full 450mm wafer. The Imprio 450 was accepted by Intel at the end of 2012 and is now being used to support the 450mm wafer process development demands as part of a multi-year wafer services contract to facilitate the semiconductor industry's transition to lower cost 450mm wafer production. The Imprio 450 uses a Jet and Flash Imprint Lithography (J-FILTM) process that employs drop dispensing of UV curable resists to assist high resolution patterning for subsequent dry etch pattern transfer. The technology is actively being used to develop solutions for markets including NAND Flash memory, patterned media for hard disk drives and displays. This paper reviews the recent performance of the J-FIL technology (including overlay, throughput and defectivity), mask development improvements provided by Dai Nippon Printing, and the application of the technology to a 450mm lithography platform.

  4. A Sharp methodology for VLSI layout

    NASA Astrophysics Data System (ADS)

    Bapat, Shekhar

    1993-01-01

    The layout problem for VLSI circuits is recognized as a very difficult problem and has been traditionally decomposed into the several seemingly independent sub-problems of placement, global routing, and detailed routing. Although this structure achieves a reduction in programming complexity, it is also typically accompanied by a reduction in solution quality. Most current placement research recognizes that the separation is artificial, and that the placement and routing problems should be solved ideally in tandem. We propose a new interconnection model, Sharp and an associated partitioning algorithm. The Sharp interconnection model uses a partitioning shape that roughly resembles the musical sharp 'number sign' and makes extensive use of pre-computed rectilinear Steiner trees. The model is designed to generate strategic routing information along with the partitioning results. Additionally, the Sharp model also generates estimates of the routing congestion. We also propose the Sharp layout heuristic that solves the layout problem in its entirety. The Sharp layout heuristic makes extensive use of the Sharp partitioning model. The use of precomputed Steiner tree forms enables the method to model accurately net characteristics. For example, the Steiner tree forms can model both the length of the net and more importantly its route. In fact, the tree forms are also appropriate for modeling the timing delays of nets. The Sharp heuristic works to minimize both the total layout area by minimizing total net length (thus reducing the total wiring area), and the congestion imbalances in the various channels (thus reducing the unused or wasted channel area). Our heuristic uses circuit element movements amongst the different partitioning blocks and selection of alternate minimal Steiner tree forms to achieve this goal. The objective function for the algorithm can be modified readily to include other important circuit constraints like propagation delays. The layout technique

  5. Wafering economies for industrialization from a wafer manufacturer's viewpoint

    NASA Astrophysics Data System (ADS)

    Rosenfield, T. P.; Fuerst, F. P.

    1982-02-01

    The key technical limitations which inhibit the lowering of value-added costs for state-of-the-art wafering techniques are assessed. From the best experimental results to date, a projection was made to identify those parts of each system which need to be developed in order to meet or improve upon the value-added cost reduction necessary for $0.70/Wp photovoltaics modules.

  6. Wafering economies for industrialization from a wafer manufacturer's viewpoint

    NASA Technical Reports Server (NTRS)

    Rosenfield, T. P.; Fuerst, F. P.

    1982-01-01

    The key technical limitations which inhibit the lowering of value-added costs for state-of-the-art wafering techniques are assessed. From the best experimental results to date, a projection was made to identify those parts of each system which need to be developed in order to meet or improve upon the value-added cost reduction necessary for $0.70/Wp photovoltaics modules.

  7. Optical printed circuit board (O-PCB) for VLSI micro/nano-photonic application

    NASA Astrophysics Data System (ADS)

    Lee, El-Hang; Lee, S. G.; O, B. H.; Park, S. G.; Kim, K. H.; Kang, J. K.; Chin, I.; Kwon, Y. K.; Choi, Y. W.

    2005-01-01

    We present, in the form of review, the results of our study on the design, fabrication and assembly of optical printed circuit boards (O-PCBs) for VLSI micro/nano-photonic applications. The O-PCBs are designed to perform the functions of transporting, switching, routing and distributing optical signals on flat modular boards, substrates or chips, in a manner similar to the electrical printed circuit boards (E-PCBs). We have assembled and constructed O-PCBs using optical waveguide arrays and circuits made of polymer materials and have examined their information handling performances. We also designed power beam splitters and waveguide filters using nano-scale photonic band-gap crystals. We discuss scientific and technological issues concerning the processes of miniaturization, interconnection and integration of polymer optical waveguide devices and arrays for O-PCB and VLSI micro/nano-photonics as applicable to board-to-board, chip-to-chip, and intra-chip integration for computers, telecommunications, and transportation systems.

  8. The design plan of a VLSI single chip (255, 223) Reed-Solomon decoder

    NASA Astrophysics Data System (ADS)

    Hsu, I. S.; Shao, H. M.; Deutsch, L. J.

    1987-11-01

    The very large-scale integration (VLSI) architecture of a single chip (255, 223) Reed-Solomon decoder for decoding both errors and erasures is described. A decoding failure detection capability is also included in this system so that the decoder will recognize a failure to decode instead of introducing additional errors. This could happen whenever the received word contains too many errors and erasures for the code to correct. The number of transistors needed to implement this decoder is estimated at about 75,000 if the delay for received message is not included. This is in contrast to the older transform decoding algorithm which needs about 100,000 transistors. However, the transform decoder is simpler in architecture than the time decoder. It is therefore possible to implement a single chip (255, 223) Reed-Solomon decoder with today's VLSI technology. An implementation strategy for the decoder system is presented. This represents the first step in a plan to take advantage of advanced coding techniques to realize a 2.0 dB coding gain for future space missions.

  9. The design plan of a VLSI single chip (255, 223) Reed-Solomon decoder

    NASA Technical Reports Server (NTRS)

    Hsu, I. S.; Shao, H. M.; Deutsch, L. J.

    1987-01-01

    The very large-scale integration (VLSI) architecture of a single chip (255, 223) Reed-Solomon decoder for decoding both errors and erasures is described. A decoding failure detection capability is also included in this system so that the decoder will recognize a failure to decode instead of introducing additional errors. This could happen whenever the received word contains too many errors and erasures for the code to correct. The number of transistors needed to implement this decoder is estimated at about 75,000 if the delay for received message is not included. This is in contrast to the older transform decoding algorithm which needs about 100,000 transistors. However, the transform decoder is simpler in architecture than the time decoder. It is therefore possible to implement a single chip (255, 223) Reed-Solomon decoder with today's VLSI technology. An implementation strategy for the decoder system is presented. This represents the first step in a plan to take advantage of advanced coding techniques to realize a 2.0 dB coding gain for future space missions.

  10. High-accuracy inspection of defects and profile of wafers by phase measuring deflectometry

    NASA Astrophysics Data System (ADS)

    Yue, Huimin; Wu, Yuxiang; Zhao, Biyu; Ou, Zhonghua; Liu, Yong

    2014-09-01

    The demands of the less-defective and high-flatness wafers are urgent in many wafer based technologies ranging from micro-electronics to the current photovoltaic industry. As the wafer becomes thinner and larger to cope with the advances in those industries, there is an increasing possibility of the emerging of crack and warp on the wafer surface. High-accuracy inspection of defects and profile are thus necessary to ensure the reliability of device. Phase measuring deflectometry(PMD) is a fast, cost-effective and high accuracy measurement technology which has been developed in recent years. As a slope measurement technology, PMD possesses a high sensitivity. Very small slope variation will lead to a large variation of the phase. PMD is very possible to have a good performance in the wafer inspection. In this paper, the requirements of the wafer inspection in the industries are discussed, and compatibility of PMD and those requirements is analyzed. In the experimental work, PMD gets the slope information of the wafer surface directly. The curvature or height information can be acquired simply by the derivation or integral of the slope. PMD is proved to make a superior result in high-precision defect detecting and shape measurement of wafer by the analysis of experiment results.

  11. On-wafer magnetic resonance of magnetite nanoparticles

    NASA Astrophysics Data System (ADS)

    Little, Charles A. E.; Russek, Stephen E.; Booth, James C.; Kabos, Pavel; Usselman, Robert J.

    2015-11-01

    Magnetic resonance measurements of ferumoxytol and TEMPO were made using an on-wafer transmission line technique with a vector network analyzer, allowing for broadband measurements of small sample volumes (4 nL) and small numbers of spins (1 nmol). On-wafer resonance measurements were compared with standard single-frequency cavity-based electron paramagnetic resonance (EPR) measurements using a new power conservation approach and the results show similar line shape. On-wafer magnetic resonance measurements using integrated microfluidics and microwave technology can significantly reduce the cost and sample volumes required for EPR spectral analysis and allow for integration of EPR with existing lab-on-a-chip processing and characterization techniques for point-of-care medical diagnostic applications.

  12. Micromachined VLSI 3D electronics. Final report for period September 1, 2000 - March 31, 2001

    SciTech Connect

    Beetz, C.P.; Steinbeck, J.; Hsueh, K.L.

    2001-03-31

    The phase I program investigated the construction of electronic interconnections through the thickness of a silicon wafer. The novel aspects of the technology are that the length-to-width ratio of the channels is as high as 100:1, so that the minimum amount of real estate is used for contact area. Constructing a large array of these through-wafer interconnections will enable two circuit die to be coupled on opposite sides of a silicon circuit board providing high speed connection between the two.

  13. Temperature Dependent Electrical Properties of PZT Wafer

    NASA Astrophysics Data System (ADS)

    Basu, T.; Sen, S.; Seal, A.; Sen, A.

    2016-04-01

    The electrical and electromechanical properties of lead zirconate titanate (PZT) wafers were investigated and compared with PZT bulk. PZT wafers were prepared by tape casting technique. The transition temperature of both the PZT forms remained the same. The transition from an asymmetric to a symmetric shape was observed for PZT wafers at higher temperature. The piezoelectric coefficient (d 33) values obtained were 560 pc/N and 234 pc/N, and the electromechanical coupling coefficient (k p) values were 0.68 and 0.49 for bulk and wafer, respectively. The reduction in polarization after fatigue was only ~3% in case of PZT bulk and ~7% for PZT wafer.

  14. Mask qualification strategies in a wafer fab

    NASA Astrophysics Data System (ADS)

    Jaehnert, Carmen; Kunowski, Angela

    2007-02-01

    Having consistent high quality photo masks is one of the key factors in lithography in the wafer fab. Combined with stable exposure- and resist processes, it ensures yield increases in production and fast learning cycles for technology development and design evaluation. Preventive controlling of incoming masks and quality monitoring while using the mask in production is essential for the fab to avoid yield loss or technical problems caused by mask issues, which eventually result in delivery problems to the customer. In this paper an overview of the procedures used for mask qualification and production release, for both logic and DRAM, at Infineon Dresden is presented. Incoming qualification procedures, such as specification checks, incoming inspection, and inline litho process window evaluation, are described here. Pinching and electrical tests, including compatibility tests for mask copies for high volume products on optimized litho processes, are also explained. To avoid mask degradation over lifetime, re-inspection checks are done for re-qualification while using the mask in production. The necessity of mask incoming inspection and re-qualification, due to the repeater printing from either the processing defects of the original mask or degrading defects of being used in the fab (i.e. haze, ESD, and moving particles, etc.), is demonstrated. The need and impact of tight mask specifications, such as CD uniformity signatures and corresponding electrical results, are shown with examples of mask-wafer CD correlation.

  15. Support apparatus for semiconductor wafer processing

    DOEpatents

    Griffiths, Stewart K.; Nilson, Robert H.; Torres, Kenneth J.

    2003-06-10

    A support apparatus for minimizing gravitational stress in semiconductor wafers, and particularly silicon wafers, during thermal processing. The support apparatus comprises two concentric circular support structures disposed on a common support fixture. The two concentric circular support structures, located generally at between 10 and 70% and 70 and 100% and preferably at 35 and 82.3% of the semiconductor wafer radius, can be either solid rings or a plurality of spaced support points spaced apart from each other in a substantially uniform manner. Further, the support structures can have segments removed to facilitate wafer loading and unloading. In order to withstand the elevated temperatures encountered during semiconductor wafer processing, the support apparatus, including the concentric circular support structures and support fixture can be fabricated from refractory materials, such as silicon carbide, quartz and graphite. The claimed wafer support apparatus can be readily adapted for use in either batch or single-wafer processors.

  16. Knowledge-based synthesis of custom VLSI physical design tools: First steps

    NASA Astrophysics Data System (ADS)

    Setliff, Dorothy E.; Rutenbar, Rob A.

    A description is given of how program synthesis techniques can be applied to the synthesis of technology-sensitive VLSI physical design tools. Physical design refers to the process of reducing a structural description of a piece of hardware down to the geometric layout of an integrated circuit. Successful physical design tools must cope with shifting technology and application environments. The goal is to automatically generate a tool's implementation to match the application. The authors describe a synthesis architecture that combines knowledge of the application domain and knowledge of generic programming mechanics. The approach uses a very high-level language to describe algorithms, domain and programming knowledge to select appropriate algorithms and data structures, and code generation to arrive at final executable code. Results are presented detailing the performance and implementation of ELF, a prototype generator for wire-routing applications. Comparisons between a hand-crafted router and an automatically synthesized router are presented.

  17. Fault model development for fault tolerant VLSI design

    NASA Astrophysics Data System (ADS)

    Hartmann, C. R.; Lala, P. K.; Ali, A. M.; Visweswaran, G. S.; Ganguly, S.

    1988-05-01

    Fault models provide systematic and precise representations of physical defects in microcircuits in a form suitable for simulation and test generation. The current difficulty in testing VLSI circuits can be attributed to the tremendous increase in design complexity and the inappropriateness of traditional stuck-at fault models. This report develops fault models for three different types of common defects that are not accurately represented by the stuck-at fault model. The faults examined in this report are: bridging faults, transistor stuck-open faults, and transient faults caused by alpha particle radiation. A generalized fault model could not be developed for the three fault types. However, microcircuit behavior and fault detection strategies are described for the bridging, transistor stuck-open, and transient (alpha particle strike) faults. The results of this study can be applied to the simulation and analysis of faults in fault tolerant VLSI circuits.

  18. Noise-margin limitations on gallium-arsenide VLSI

    NASA Technical Reports Server (NTRS)

    Long, Stephen I.; Sundaram, Mani

    1988-01-01

    Two factors which limit the complexity of GaAs MESFET VLSI circuits are considered. Power dissipation sets an upper complexity limit for a given logic circuit implementation and thermal design. Uniformity of device characteristics and the circuit configuration determines the electrical functional yield. Projection of VLSI complexity based on these factors indicates that logic chips of 15,000 gates are feasible with the most promising static circuits if a maximum power dissipation of 5 W per chip is assumed. While lower power per gate and therefore more gates per chip can be obtained by using a popular E/D FET circuit, yields are shown to be small when practical device parameter tolerances are applied. Further improvements in materials, devices, and circuits wil be needed to extend circuit complexity to the range currently dominated by silicon.

  19. New fabrication method of glass packages with inclined optical windows for micromirrors on wafer level

    NASA Astrophysics Data System (ADS)

    Stenchly, Vanessa; Quenzer, Hans-Joachim; Hofmann, Ulrich; Janes, Joachim; Jensen, Björn; Benecke, Wolfgang

    2013-03-01

    For many applications it is inevitable to protect MEMS devices against environmental impacts like humidity which can affect their performance. Moreover recent publications demonstrates that micro mirrors can achieve very large optical scan angles at moderate driving voltages even exceeding 100 degrees when hermetically sealed under vacuum. While discrete chips may be evacuated and sealed on single die level using small can packages like TO housings, it is obvious that for high volume production a much more economical solution for the realisation of transparent optical packages already on wafer level must be developed. However, since any laser beam crossing a transparent glass surface is partly reflected even when anti-reflective coatings are applied, the construction of a wafer level optical housing suitable for laser projection purpose requires more than the integration of simple plane glass cap. The use of inclined optical windows avoids the occurrence of intense reflections of the incident laser beam in the projected images. This paper describes a unique technology to fabricate glass packages with inclined optical windows for micro mirrors on 8 inch wafers. The new process uses a high temperature glass forming process based on subsequent wafer bonding. A borosilicate glass wafer is bonded together with two structured silicon wafers. By grinding both sides of the wafer stack, a pattern of isolated silicon structures is defined. This preprocessed glass wafer is bonded thereon on a third structured silicon wafer, wherein the silicon islands are inserted into the cavities. By setting a defined pressure level inside the cavities during the final wafer bonding, the silicon glass stack extruded and it is out of plane during a subsequent annealing process at temperatures above the softening point of the glass. Finally the silicon is selectively removed in a wet etching process. This technique allows the fabrication of 8 inch glass wafers with oblique optical surfaces

  20. Radiation hardness and annealing tests of a custom VLSI device

    SciTech Connect

    Breakstone, A.; Parker, S.; Adolphsen, C.; Litke, A.; Schwarz, A.; Turala, M.; Lueth, V.; California Univ., Santa Cruz, CA . Inst. for Particle Physics; Stanford Linear Accelerator Center, Menlo Park, CA )

    1986-10-01

    Several NMOS custom VLSI ( Microplex'') circuits have been irradiated with a 500 rad/hr {sup 60}Co source. With power off three of four chips tested have survived doses exceeding 1 Mrad. With power on at a 25% duty cycle, all chips tested failed at doses ranging from 10 to 130 krad. Annealing at 200{degree}C was only partially successful in restoring the chips to useful operating conditions. 10 refs., 4 figs., 1 tab.

  1. A VLSI design of a pipeline Reed-Solomon decoder

    NASA Technical Reports Server (NTRS)

    Shao, H. M.; Truong, T. K.; Deutsch, L. J.; Yuen, J. H.; Reed, I. S.

    1985-01-01

    A pipeline structure of a transform decoder similar to a systolic array was developed to decode Reed-Solomon (RS) codes. An important ingredient of this design is a modified Euclidean algorithm for computing the error locator polynomial. The computation of inverse field elements is completely avoided in this modification of Euclid's algorithm. The new decoder is regular and simple, and naturally suitable for VLSI implementation.

  2. A VLSI single chip 8-bit finite field multiplier

    NASA Technical Reports Server (NTRS)

    Deutsch, L. J.; Shao, H. M.; Hsu, I. S.; Truong, T. K.

    1985-01-01

    A Very Large Scale Integration (VLSI) architecture and layout for an 8-bit finite field multiplier is described. The algorithm used in this design was developed by Massey and Omura. A normal basis representation of finite field elements is used to reduce the multiplication complexity. It is shown that a drastic improvement was achieved in this design. This multiplier will be used intensively in the implementation of an 8-bit Reed-Solomon decoder and in many other related projects.

  3. High performance LWIR microbolometer with Si/SiGe quantum well thermistor and wafer level packaging

    NASA Astrophysics Data System (ADS)

    Roer, Audun; Lapadatu, Adriana; Bring, Martin; Wolla, Erik; Hohler, Erling; Kittilsland, Gjermund

    2011-11-01

    An uncooled microbolometer with peak responsivity in the long wave infrared region of the electromagnetic radiation is developed at Sensonor Technologies. It is a 384 x 288 focal plane array with a pixel pitch of 25μm, based on monocrystalline Si/SiGe quantum wells as IR sensitive material. The high sensitivity (TCR) and low 1/f noise are the main performance characteristics of the product. The frame rate is maximum 60Hz and the output interface is digital (LVDS). The quantum well thermistor material is transferred to the read-out integrated circuit (ROIC) by direct wafer bonding. The ROIC wafer containing the released pixels is bonded in vacuum with a silicon cap wafer, providing hermetic encapsulation at low cost. The resulting wafer stack is mounted in a standard ceramic package. In this paper the architecture of the pixels and the ROIC, the wafer packaging and the electro-optical measurement results are presented.

  4. ULYSSES - an expert-system-based VLSI design environment

    SciTech Connect

    Bushnell, M.L.

    1987-01-01

    Ulysses is a VLSI computer-aided design (CAD) environment which effectively addresses the problems associated with CAD tool integration. Specifically, Ulysses allows the integration of CAD tools into a design automation (DA) system, the codification of a design methodology, and the representation of a design space. Ulysses keeps track of the progress of a design and allows exploration of the design space. The environment employs artificial intelligence techniques, functions as an interactive expert system, and interprets descriptions of design tasks encoded in the scripts language. An integrated-circuit silicon compilation task is presented as an example of the ability of Ulysses to automatically execute CAD tools to solve a problem where inferencing is required to obtain a viable VLSI layout. The inferencing mechanism, in the form of a controlled production system, allows Ulysses to recover when routing channel congestion or over-constrained leaf-cell boundary conditions make it impossible for CAD tools to complete layouts. Also, Ulysses allows the designer to intervene while design activities are being carried out. Consistency-maintenance rules encoded in the scripts language enforce geometric floor-plan consistency when CAD tools fail and when the designer makes adjustments to a VLSI chip layout.

  5. Fault sensitivity and wear-out analysis of VLSI systems

    NASA Astrophysics Data System (ADS)

    Choi, Gwan Seung

    1994-07-01

    This thesis describes simulation approaches to conduct fault sensitivity and wear-out failure analysis of VLSI systems. A fault-injection approach to study transient impact in VLSI systems is developed. Through simulated fault injection at the device level and, subsequent fault propagation at the gate functional and software levels, it is possible to identify critical bottlenecks in dependability. Techniques to speed up the fault simulation and to perform statistical analysis of fault-impact are developed. A wear-out simulation environment is also developed to closely mimic dynamic sequences of wear-out events in a device through time, to localize weak location/aspect of target chip and to allow generation of TTF (Time-to-failure) distribution of VLSI chip as a whole. First, an accurate simulation of a target chip and its application code is performed to acquire trace data (real workload) on switch activity. Then, using this switch activity information, wear-out of the each component in the entire chip is simulated using Monte Carlo techniques.

  6. Wafer CD variation for random units of track and polarization

    NASA Astrophysics Data System (ADS)

    Ning, Guoxiang; Ackmann, Paul; Richter, Frank; Kurth, Karin; Maelzer, Stephanie; Hsieh, Michael; Schurack, Frank; GN, Fang Hong

    2012-03-01

    After wafer processing in a scanner the process of record (POR) flows in a photo track are characterized by a random correlation between post exposure bake (PEB) and development (DEV) units of the photo track. The variation of the critical dimensions (CD) of the randomly correlated units used for PEB and DEV should be as small as possible - especially for technology nodes of 28nm and below. Even a point-to-point error of only 1nm could affect the final product yield results due to the relatively narrow process window of 28nm tech-node. The correlation between reticle measurements to target (MTT) and wafer MTT may in addition be influenced by the random correlation between units used for PEB and DEV. The polarization of the light source of the scanner is one of the key points for the wafer CD performance too - especially for the critical dimensions uniformity (CDU) performance. We have investigated two track flows, one with fixed and one with random unit correlation. The reticle used for the experiments is a 28nm active layer sample reticle. The POR track flow after wafer process in the scanner is characterized by a random correlation between PEB- and DEV-units. The set-up of the engineering (ENG) process flow is characterized by a fixed unit correlation between PEB- and development-units. The critical dimension trough pitch (CDTP) and linearity performance is demonstrated; also the line-end performance for two dimensional (2D) structures is shown. The sub-die of intra-field CDU for isolated and dense structures is discussed as well as the wafer intra-field CD performance. The correlation between reticle MTT and wafer intra-field MTT is demonstrated for track POR and ENG processes. For different polarization conditions of the scanner source, the comparison of CDU for isolated and dense features has been shown. The dependency of the wafer intra-field MTT with respect to different polarization settings of the light source is discussed. The correlation between reticle

  7. Sensor-based driving of a car with fuzzy inferencing VLSI chips and boards. [Very Large Scale Integration (VLSI)

    SciTech Connect

    Pin, F.G.; Watanabe, Y.

    1992-01-01

    This paper discusses the sensor-based driving of a car in a-priori unknown environments using human-like'' reasoning schemes. The schemes are implemented on custom-designed VLSI fuzzy inferencing boards and are used to investigate two control modes for driving a car on the basis of very sparse and imprecise range data. In the first mode, the car navigates fully autonomously, while in the second mode, the system acts as a driver's aid providing the driver with linguistic (fuzzy) commands to turn left or right and speed up, slow down, stop, or back up depending on the obstacles perceived by the sensors. Experiments with both modes of control are described in which the system uses only three acoustic range (sonar) sensor channels to perceive the environment. Sample results are presented which illustrate the feasibility of developing autonomous navigation systems and robust safety enhancing driver's aid using the new fuzzy inferencing VLSI hardware and human-like'' reasoning schemes.

  8. Impact of VLSI/VHSIC on satellite on-board signal processing

    NASA Astrophysics Data System (ADS)

    Aanstoos, J. V.; Ruedger, W. H.; Snyder, W. E.; Kelly, W. L.

    Forecasted improvements in IC fabrication techniques, such as the use of X-ray lithography, are expected to yield submicron circuit feature sizes within the decade of the 1980s. As dimensions decrease, reliability, cost, speed, power consumption and density improvements will be realized which have a significant impact on the capabilities of onboard spacecraft signal processing functions. This will in turn result in increases of the intelligence that may be deployed on spaceborne remote sensing platforms. Among programs oriented toward such goals are the silicon-based Very High Speed Integrated Circuit (VHSIC) researches sponsored by the U.S. Department of Defense, and efforts toward the development of GaAs devices which will compete with silicon VLSI technology for future applications. GaAs has an electron mobility which is five to six times that of silicon, and promises commensurate computation speed increases under low field conditions.

  9. VLSI Potentiostat Array With Oversampling Gain Modulation for Wide-Range Neurotransmitter Sensing.

    PubMed

    Stanacevic, M; Murari, K; Rege, A; Cauwenberghs, G; Thakor, N V

    2007-03-01

    A 16-channel current-measuring very large-scale integration (VLSI) sensor array system for highly sensitive electrochemical detection of electroactive neurotransmiters like dopamine and nitric-oxide is presented. Each channel embeds a current integrating potentiostat within a switched-capacitor first-order single-bit delta-sigma modulator implementing an incremental analog-to-digital converter. The duty-cycle modulation of current feedback in the delta-sigma loop together with variable oversampling ratio provide a programmable digital range selection of the input current spanning over six orders of magnitude from picoamperes to microamperes. The array offers 100-fA input current sensitivity at 3.4-muW power consumption per channel. The operation of the 3 mm times3 mm chip fabricated in 0.5-mum CMOS technology is demonstrated with real-time multichannel acquisition of neurotransmitter concentration. PMID:23851522

  10. An Efficient VLSI Architecture for Multi-Channel Spike Sorting Using a Generalized Hebbian Algorithm

    PubMed Central

    Chen, Ying-Lun; Hwang, Wen-Jyi; Ke, Chi-En

    2015-01-01

    A novel VLSI architecture for multi-channel online spike sorting is presented in this paper. In the architecture, the spike detection is based on nonlinear energy operator (NEO), and the feature extraction is carried out by the generalized Hebbian algorithm (GHA). To lower the power consumption and area costs of the circuits, all of the channels share the same core for spike detection and feature extraction operations. Each channel has dedicated buffers for storing the detected spikes and the principal components of that channel. The proposed circuit also contains a clock gating system supplying the clock to only the buffers of channels currently using the computation core to further reduce the power consumption. The architecture has been implemented by an application-specific integrated circuit (ASIC) with 90-nm technology. Comparisons to the existing works show that the proposed architecture has lower power consumption and hardware area costs for real-time multi-channel spike detection and feature extraction. PMID:26287193

  11. An Efficient VLSI Architecture of the Enhanced Three Step Search Algorithm

    NASA Astrophysics Data System (ADS)

    Biswas, Baishik; Mukherjee, Rohan; Saha, Priyabrata; Chakrabarti, Indrajit

    2015-02-01

    The intense computational complexity of any video codec is largely due to the motion estimation unit. The Enhanced Three Step Search is a popular technique that can be adopted for fast motion estimation. This paper proposes a novel VLSI architecture for the implementation of the Enhanced Three Step Search Technique. A new addressing mechanism has been introduced which enhances the speed of operation and reduces the area requirements. The proposed architecture when implemented in Verilog HDL on Virtex-5 Technology and synthesized using Xilinx ISE Design Suite 14.1 achieves a critical path delay of 4.8 ns while the area comes out to be 2.9K gate equivalent. It can be incorporated in commercial devices like smart-phones, camcorders, video conferencing systems etc.

  12. Wafer-bonded surface plasmon waveguides

    NASA Astrophysics Data System (ADS)

    Berini, Pierre; Mattiussi, Greg; Lahoud, Nancy; Charbonneau, Robert

    2007-02-01

    Direct wafer bonding and thinning were explored as an approach for constructing long-range surface plasmon waveguides. The structures consist of a thin metal stripe deposited into a shallow trench etched into one of the claddings, to which another cladding of the same material is directly bonded. The approach was developed first using Pyrex wafers in order to assess feasibility and then using lithium niobate wafers. Optical and electro-optical measurements validate the approach.

  13. Development of a Whole-Wafer, Macroscale Inspection Software Method for Semiconductor Wafer Analysis

    SciTech Connect

    Tobin, K.W.

    2003-05-22

    This report describes the non CRADA-protected results of the project performed between Nova Measuring Systems, Ltd., and the Oak Ridge National Laboratory to test and prototype defect signature analysis method for potential incorporation into an in-situ wafer inspection microscope. ORNL's role in this activity was to collaborate with Nova on the analysis and software side of the effort, wile Nova's role was to build the physical microscope and provide data to ORNL for test and evaluation. The objective of this project was to adapt and integrate ORNL's SSA and ADC methods and technologies in the Nova imaging environment. ORNL accomplished this objective by modifying the existing SSA technology for use as a wide-area signature analyzer/classifier on the Nova macro inspection tool (whole-wafer analysis). During this effort ORNL also developed a strategy and methodology for integrating and presenting the results of SSA/ADC analysis to the tool operator and/or data management system (DMS) used by the semiconductor manufacturer (i.e., the end-user).

  14. Performance Evaluations of Ceramic Wafer Seals

    NASA Technical Reports Server (NTRS)

    Dunlap, Patrick H., Jr.; DeMange, Jeffrey J.; Steinetz, Bruce M.

    2006-01-01

    Future hypersonic vehicles will require high temperature, dynamic seals in advanced ramjet/scramjet engines and on the vehicle airframe to seal the perimeters of movable panels, flaps, and doors. Seal temperatures in these locations can exceed 2000 F, especially when the seals are in contact with hot ceramic matrix composite sealing surfaces. NASA Glenn Research Center is developing advanced ceramic wafer seals to meet the needs of these applications. High temperature scrub tests performed between silicon nitride wafers and carbon-silicon carbide rub surfaces revealed high friction forces and evidence of material transfer from the rub surfaces to the wafer seals. Stickage between adjacent wafers was also observed after testing. Several design changes to the wafer seals were evaluated as possible solutions to these concerns. Wafers with recessed sides were evaluated as a potential means of reducing friction between adjacent wafers. Alternative wafer materials are also being considered as a means of reducing friction between the seals and their sealing surfaces and because the baseline silicon nitride wafer material (AS800) is no longer commercially available.

  15. Stress Voiding During Wafer Processing

    SciTech Connect

    Yost, F.G.

    1999-03-01

    Wafer processing involves several heating cycles to temperatures as high as 400 C. These thermal excursions are known to cause growth of voids that limit reliability of parts cut from the wafer. A model for void growth is constructed that can simulate the effect of these thermal cycles on void growth. The model is solved for typical process steps and the kinetics and extent of void growth are determined for each. It is shown that grain size, void spacing, and conductor line width are very important in determining void and stress behavior. For small grain sizes, stress relaxation can be rapid and can lead to void shrinkage during subsequent heating cycles. The effect of rapid quenching from process temperatures is to suppress void growth but induce large remnant stress in the conductor line. This stress can provide the driving force for void growth during storage even at room temperature. For isothermal processes the model can be solved analytically and estimates of terminal void size a nd lifetime are obtained.

  16. MEMS packaging with etching and thinning of lid wafer to form lids and expose device wafer bond pads

    SciTech Connect

    Chanchani, Rajen; Nordquist, Christopher; Olsson, Roy H; Peterson, Tracy C; Shul, Randy J; Ahlers, Catalina; Plut, Thomas A; Patrizi, Gary A

    2013-12-03

    In wafer-level packaging of microelectromechanical (MEMS) devices a lid wafer is bonded to a MEMS wafer in a predermined aligned relationship. Portions of the lid wafer are removed to separate the lid wafer into lid portions that respectively correspond in alignment with MEMS devices on the MEMS wafer, and to expose areas of the MEMS wafer that respectively contain sets of bond pads respectively coupled to the MEMS devices.

  17. vPELS: An E-Learning Social Environment for VLSI Design with Content Security Using DRM

    ERIC Educational Resources Information Center

    Dewan, Jahangir; Chowdhury, Morshed; Batten, Lynn

    2014-01-01

    This article provides a proposal for personal e-learning system (vPELS [where "v" stands for VLSI: very large scale integrated circuit])) architecture in the context of social network environment for VLSI Design. The main objective of vPELS is to develop individual skills on a specific subject--say, VLSI--and share resources with peers.…

  18. A reclaiming process for solar cell silicon wafer surfaces.

    PubMed

    Pa, P S

    2011-01-01

    The low yield of epoxy film and Si3N4 thin-film deposition is an important factor in semiconductor production. A new design system using a set of three lamination-shaped electrodes as a machining tool and micro electro-removal as a precision reclaiming process of the Si3N4 layer and epoxy film removal from silicon wafers of solar cells surface is presented. In the current experiment, the combination of the small thickness of the anode and cathodes corresponds to a higher removal rate for the thin films. The combination of the short length of the anode and cathodes combined with enough electric power produces fast electroremoval. A combination of the small edge radius of the anode and cathodes corresponds to a higher removal rate. A higher feed rate of silicon wafers of solar cells combined with enough electric power produces fast removal. A precise engineering technology constructed a clean production approach for the removal of surface microstructure layers from silicon wafers is to develop a mass production system for recycling defective or discarded silicon wafers from solar cells that can reduce pollution and lower cost. PMID:21446525

  19. A VLSI Reed-Solomon decoder architecture for concatenate-coded space and spread spectrum communications

    NASA Astrophysics Data System (ADS)

    Liu, K. Y.

    In this paper, a VLSI Reed-Solomon (RS) decoder architecture for concatenate-coded space and spread spectrum communications, is presented. The known decoding procedures for RS codes are exploited and modified to obtain a repetitive and recursive decoding technique which is suitable for VLSI implementation and pipeline processing.

  20. A VLSI Reed-Solomon decoder architecture for concatenate-coded space and spread spectrum communications

    NASA Technical Reports Server (NTRS)

    Liu, K. Y.

    1983-01-01

    In this paper, a VLSI Reed-Solomon (RS) decoder architecture for concatenate-coded space and spread spectrum communications, is presented. The known decoding procedures for RS codes are exploited and modified to obtain a repetitive and recursive decoding technique which is suitable for VLSI implementation and pipeline processing.

  1. Kerfless Silicon Precursor Wafer Formed by Rapid Solidification: October 2009 - March 2010

    SciTech Connect

    Lorenz, A.

    2011-06-01

    1366 Direct Wafer technology is an ultra-low-cost, kerfless method of producing crystalline silicon wafers compatible with the existing dominant silicon PV supply chain. By doubling utilization of silicon and simplifying the wafering process and equipment, Direct Wafers will support drastic reductions in wafer cost and enable module manufacturing costs < $1/W. This Pre-Incubator subcontract enabled us to accelerate the critical advances necessary to commercialize the technology by 2012. Starting from a promising concept that was initially demonstrated using a model material, we built custom equipment necessary to validate the process in silicon, then developed sufficient understanding of the underlying physics to successfully fabricate wafers meeting target specifications. These wafers, 50 mm x 50 mm x 200 ..mu..m thick, were used to make prototype solar cells via standard industrial processes as the project final deliverable. The demonstrated 10% efficiency is already impressive when compared to most thin films, but still offers considerable room for improvement when compared to typical crystalline silicon solar cells.

  2. MUSE - a systolic array for adaptive nulling with 64 degrees of freedom, using Givens transformations and wafer-scale integration. Technical report

    SciTech Connect

    Rader, C.M.; Allen, D.L.; gLASCO , D.B.; Woodward, C.E.

    1990-05-18

    This report describes an architecture for a highly parallel system of computational processors specialized for real-time adaptive antenna nulling computations with many degrees of freedom, which we call MUSE (Matrix Update Systolic Experiment), and a specific realization of MUSE for 64 degrees of freedom. Each processor uses the CORDIC algorithm and has been designed as a single integrated circuit. Ninety-six such processors working together can update the 64-element nulling weights based on 300 new observations in only 6.7 milliseconds. This is equivalent to 2.88 Giga-ops for a conventional processor. The computations are accurate enough to support 50 decibel of signal-to-noise improvement in a sidelobe canceller. The connectivity between processors is quite simple and permits MUSE to be realized on a single large wafer, using restructurable VLSI (Very Large Scale Integration). The complete design of such a wafer is described.

  3. A universal process development methodology for complete removal of residues from 300mm wafer edge bevel

    NASA Astrophysics Data System (ADS)

    Randall, Mai; Linnane, Michael; Longstaff, Chris; Ueda, Kenichi; Winter, Tom

    2006-03-01

    Many yield limiting, etch blocking defects are attributed to "flake" type contamination from the lithography process. The wafer edge bevel is a prime location for generation of this type of defect. Wafer bevel quality is not readily observed with top down or even most off axis inspection equipment. Not all chemistries are removed with one "universal" cleaning process. IC manufacturers must maximize usable silicon area as well. These requirements have made traditional chemical treatments to clean the wafer edge inadequate for many chemistry types used in 193nm processing. IBM has evaluated a method to create a robust wafer bevel and backside cleaning process. An August Technology AXi TM Series advanced macro inspection tool with E20 TM edge inspection module has been used to check wafer bevel cleanliness. Process impact on the removal of post apply residues has been investigated. The new process used backside solvent rinse nozzles only and cleaned the wafer bevel completely. The use of the topside edge solvent clean nozzles was eliminated. Thickness, wet film defect measurements (wet FM), and pattern wafer defect monitors showed no difference between the new backside rinse edge bead removal process and the process of record. Solvent topside edge bead removal of both bottom anti-reflective coatings and resist materials showed better cut width control and uniformity. We conclude that the topside solvent edge bead removal nozzle can be removed from the process. Backside solvent rinse nozzles can clean the backside of the wafer, the wafer bevel, and can wrap to the front edge of the wafer to provide a uniform edge bead removal cut width that is not sensitive to coater module tolerances. Recommendations are made for changes to the typical preventive maintenance procedures.

  4. Methane production using resin-wafer electrodeionization

    DOEpatents

    Snyder, Seth W; Lin, YuPo; Urgun-Demirtas, Meltem

    2014-03-25

    The present invention provides an efficient method for creating natural gas including the anaerobic digestion of biomass to form biogas, and the electrodeionization of biogas to form natural gas and carbon dioxide using a resin-wafer deionization (RW-EDI) system. The method may be further modified to include a wastewater treatment system and can include a chemical conditioning/dewatering system after the anaerobic digestion system. The RW-EDI system, which includes a cathode and an anode, can either comprise at least one pair of wafers, each a basic and acidic wafer, or at least one wafer comprising of a basic portion and an acidic portion. A final embodiment of the RW-EDI system can include only one basic wafer for creating natural gas.

  5. Process variation monitoring (PVM) by wafer inspection tool as a complementary method to CD-SEM for mapping field CDU on advanced production devices

    NASA Astrophysics Data System (ADS)

    Kim, Dae Jong; Yoo, Hyung Won; Kim, Chul Hong; Lee, Hak Kwon; Kim, Sung Su; Bae, Koon Ho; Spielberg, Hedvi; Lee, Yun Ho; Levi, Shimon; Bustan, Yariv; Rozentsvige, Moshe

    2010-03-01

    As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) have a dramatic effect on printed final lines and hence the need to control these parameters increases. Sources of CDU and LER variations include scanner auto-focus accuracy and stability, layer stack thickness, composition variations, and exposure variations. Process variations, in advanced VLSI production designs, specifically in memory devices, attributed to CDU and LER affect cell-to-cell parametric variations. These variations significantly impact device performance and die yield. Traditionally, measurements of LER are performed by CD-SEM or OCD metrology tools. Typically, these measurements require a relatively long time to set and cover only selected points of wafer area. In this paper we present the results of a collaborative work of the Process Diagnostic & Control Business Unit of Applied Materials and Hynix Semiconductor Inc. on the implementation of a complementary method to the CDSEM and OCD tools, to monitor defect density and post litho develop CDU and LER on production wafers. The method, referred to as Process Variation Monitoring (PVM) is based on measuring variations in the scattered light from periodic structures. The application is demonstrated using Applied Materials DUV bright field (BF) wafer inspection tool under optimized illumination and collection conditions. The UVisionTM has already passed a successful feasibility study on DRAM products with 66nm and 54nm design rules. The tool has shown high sensitivity to variations across an FEM wafer in both exposure and focus axes. In this article we show how PVM can help detection of Field to Field variations on DRAM wafers with 44nm design rule during normal production run. The complex die layout and the shrink in cell dimensions require high sensitivity to local variations within Dies or Fields. During normal scan of production wafers local Process variations are translated into GL (Grey Level) values

  6. Improvement of process control using wafer geometry for enhanced manufacturability of advanced semiconductor devices

    NASA Astrophysics Data System (ADS)

    Lee, Honggoo; Lee, Jongsu; Kim, Sang Min; Lee, Changhwan; Han, Sangjun; Kim, Myoungsoo; Kwon, Wontaik; Park, Sung-Ki; Vukkadala, Pradeep; Awasthi, Amartya; Kim, J. H.; Veeraraghavan, Sathish; Choi, DongSub; Huang, Kevin; Dighe, Prasanna; Lee, Cheouljung; Byeon, Jungho; Dey, Soham; Sinha, Jaydeep

    2015-03-01

    Aggressive advancements in semiconductor technology have resulted in integrated chip (IC) manufacturing capability at sub-20nm half-pitch nodes. With this, lithography overlay error budgets are becoming increasingly stringent. The delay in EUV lithography readiness for high volume manufacturing (HVM) and the need for multiple-patterning lithography with 193i technology has further amplified the overlay issue. Thus there exists a need for technologies that can improve overlay errors in HVM. The traditional method for reducing overlay errors predominantly focused on improving lithography scanner printability performance. However, processes outside of the lithography sector known as processinduced overlay errors can contribute significantly to the total overlay at the current requirements. Monitoring and characterizing process-induced overlay has become critical for advanced node patterning. Recently a relatively new technique for overlay control that uses high-resolution wafer geometry measurements has gained significance. In this work we present the implementation of this technique in an IC fabrication environment to monitor wafer geometry changes induced across several points in the process flow, of multiple product layers with critical overlay performance requirement. Several production wafer lots were measured and analyzed on a patterned wafer geometry tool. Changes induced in wafer geometry as a result of wafer processing were related to down-stream overlay error contribution using the analytical in-plane distortion (IPD) calculation model. Through this segmentation, process steps that are major contributors to down-stream overlay were identified. Subsequent process optimization was then isolated to those process steps where maximum benefit might be realized. Root-cause for the within-wafer, wafer-to-wafer, tool-to-tool, and station-to-station variations observed were further investigated using local shape curvature changes - which is directly related to

  7. A VLSI architecture for simplified arithmetic Fourier transform algorithm

    NASA Technical Reports Server (NTRS)

    Reed, Irving S.; Shih, Ming-Tang; Truong, T. K.; Hendon, E.; Tufts, D. W.

    1992-01-01

    The arithmetic Fourier transform (AFT) is a number-theoretic approach to Fourier analysis which has been shown to perform competitively with the classical FFT in terms of accuracy, complexity, and speed. Theorems developed in a previous paper for the AFT algorithm are used here to derive the original AFT algorithm which Bruns found in 1903. This is shown to yield an algorithm of less complexity and of improved performance over certain recent AFT algorithms. A VLSI architecture is suggested for this simplified AFT algorithm. This architecture uses a butterfly structure which reduces the number of additions by 25 percent of that used in the direct method.

  8. Image and Video Compression with VLSI Neural Networks

    NASA Technical Reports Server (NTRS)

    Fang, W.; Sheu, B.

    1993-01-01

    An advanced motion-compensated predictive video compression system based on artificial neural networks has been developed to effectively eliminate the temporal and spatial redundancy of video image sequences and thus reduce the bandwidth and storage required for the transmission and recording of the video signal. The VLSI neuroprocessor for high-speed high-ratio image compression based upon a self-organization network and the conventional algorithm for vector quantization are compared. The proposed method is quite efficient and can achieve near-optimal results.

  9. Chaotic neuron models and their VLSI circuit implementations.

    PubMed

    Hsu, C C; Gobovic, D; Zaghloul, M E; Szu, H H

    1996-01-01

    The design of a chaotic neuron model is proposed and implemented in a CMOS very large scale integration (VLSI) chip. The transfer function of the neuron is defined as a piecewise linear (PWL) N-shaped function. In this paper, the new concept of the baseline function is introduced. It is the mapping of the neuron state to the neuron output. It is used to control the chaotic behavior of collective neurons. The chaotic behavior is analyzed and verified by Lyapunov exponents. An analog CMOS chip was designed to implement the theory and it was fabricated through the MOSIS program. The measurement diagnoses of the chip is demonstrated. PMID:18263529

  10. A VLSI design of a pipeline Reed-Solomon decoder.

    PubMed

    Shao, H M; Truong, T K; Deutsch, L J; Yuen, J H; Reed, I S

    1985-05-01

    A pipeline structure of a transform decoder similar to a systolic array is developed to decode Reed-Solomon (RS) codes. An important ingredient of this design is a modified Euclidean algorithm for computing the error-locator polynomial. The computation of inverse field elements is completely avoided in this modification of Euclid's algorithm. The new coder is regular and simple, and naturally suitable for VLSI implementation. An example illustrating both the pipeline and systolic array aspects of this decoder structure is given for a RS code. PMID:11539661

  11. A digital neuron-type processor and its VLSI design

    SciTech Connect

    Habib, M.K.; Akel, H. )

    1989-05-01

    A set of neuron-type circuits elements based on logic gate circuits with multi-input capability is described. Three types of elements are introduced, one called the cell body with its dendritic inputs and synaptic junction, another representing the axon base and finally the axon circuit. These three elements are cascaded to form a neuron type processing element. The circuit performs input temporal and spatial summation as well as thresholding. The entire neuron circuit is simulated and a design is given using VLSI techniques.

  12. An adaptive, lossless data compression algorithm and VLSI implementations

    NASA Technical Reports Server (NTRS)

    Venbrux, Jack; Zweigle, Greg; Gambles, Jody; Wiseman, Don; Miller, Warner H.; Yeh, Pen-Shu

    1993-01-01

    This paper first provides an overview of an adaptive, lossless, data compression algorithm originally devised by Rice in the early '70s. It then reports the development of a VLSI encoder/decoder chip set developed which implements this algorithm. A recent effort in making a space qualified version of the encoder is described along with several enhancements to the algorithm. The performance of the enhanced algorithm is compared with those from other currently available lossless compression techniques on multiple sets of test data. The results favor our implemented technique in many applications.

  13. An Asynchronous Low Power and High Performance VLSI Architecture for Viterbi Decoder Implemented with Quasi Delay Insensitive Templates

    PubMed Central

    Devi, T. Kalavathi; Palaniappan, Sakthivel

    2015-01-01

    Convolutional codes are comprehensively used as Forward Error Correction (FEC) codes in digital communication systems. For decoding of convolutional codes at the receiver end, Viterbi decoder is often used to have high priority. This decoder meets the demand of high speed and low power. At present, the design of a competent system in Very Large Scale Integration (VLSI) technology requires these VLSI parameters to be finely defined. The proposed asynchronous method focuses on reducing the power consumption of Viterbi decoder for various constraint lengths using asynchronous modules. The asynchronous designs are based on commonly used Quasi Delay Insensitive (QDI) templates, namely, Precharge Half Buffer (PCHB) and Weak Conditioned Half Buffer (WCHB). The functionality of the proposed asynchronous design is simulated and verified using Tanner Spice (TSPICE) in 0.25 µm, 65 nm, and 180 nm technologies of Taiwan Semiconductor Manufacture Company (TSMC). The simulation result illustrates that the asynchronous design techniques have 25.21% of power reduction compared to synchronous design and work at a speed of 475 MHz. PMID:26558289

  14. A self-priming, high performance, check valve diaphragm micropump made from SOI wafers

    NASA Astrophysics Data System (ADS)

    Kang, Jianke; Mantese, Joseph V.; Auner, Gregory W.

    2008-12-01

    In this paper, we describe a self-priming high performance piezoelectrically actuated check valve diaphragm micropump. The micropump was fabricated from three wafers: two silicon-on-insulator (SOI) wafers and one silicon wafer. A process named 'SOI/SOI wafer bonding and etching back followed by a second wafer bonding' was developed in order to make the core components of this device which included an inlet check valve, an outlet check valve, a diaphragm and a chamber. The movable structures of this device, i.e. the check valves and the diaphragm, were fabricated from the device layers of the two bonded SOI wafers. Taking advantages of SOI wafer technology and etch-stop layers, the vertical parameters of the movable structures were precisely controlled in fabrication. The micropump was self-priming without any pre-filling process. The pumping rate of the micropump was linearly adjustable from 0 to 650l µm min-1 by adjusting frequency. The maximum pumping rate was 860 µl min-1 and the maximum pumping pressure was approximately 10.5 psi. The power consumption of the device was less than 1.2 mW.

  15. Qualification procedures for VHSIC/VLSI

    NASA Astrophysics Data System (ADS)

    Baumes, Thomas A.

    1990-12-01

    This program developed, outlined, refined, and verified the test methodology and qualification criteria and procedures to be used to ensure the integrity and reliability of microcircuit devices designed for insertion into military systems. A major portion of the criteria and procedures, reflected herein, enables a significant reduction in time and cost of the microcircuit Quality/Reliability Assurance process by addressing up front simulations during design prior to commitment, complex and expensive manufacturing processes with in-line quality processes controlled by a SPC (Statistical Process Control) program and ongoing QA Program using their TRB (Technology Review Board) and SEC (Standard Evaluation Circuit) programs.

  16. A silicon wafer packaging solution for HB-LEDs

    NASA Astrophysics Data System (ADS)

    Murphy, Tom; Weichel, Steen; Isaacs, Steven; Kuhmann, Jochen

    2007-09-01

    In this paper we present HyLED, a silicon wafer packaging solution for high-brightness LEDs. The associated technology is batch micro-machining/metallisation processing of silicon wafers allowing significant reduction of the final device size. The presented package is multi-functional where the micro-machined cavity acts as reflector, thermal conductor and reservoir for the silicone/colour conversion substance. The base material, silicon, has excellent mechanical and thermal properties and enables direct integration of intelligence. We present customer specific solutions, open tool samples and performance data for optical and thermal parameters and reliability testing. Thermal resistance values of R<5 K/W, junction-to-board are demonstrated.

  17. Development of megasonic cleaning for silicon wafers

    NASA Technical Reports Server (NTRS)

    Mayer, A.

    1980-01-01

    A cleaning and drying system for processing at least 2500 three in. diameter wafers per hour was developed with a reduction in process cost. The system consists of an ammonia hydrogen peroxide bath in which both surfaces of 3/32 in. spaced, ion implanted wafers are cleaned in quartz carriers moved on a belt past two pairs of megasonic transducers. The wafers are dried in the novel room temperature, high velocity air dryer in the same carriers used for annealing. A new laser scanner was used effectively to monitor the cleaning ability on a sampling basis.

  18. Material requirements for the adoption of unconventional silicon crystal and wafer growth techniques for high-efficiency solar cells

    DOE PAGESBeta

    Hofstetter, Jasmin; del Cañizo, Carlos; Wagner, Hannes; Castellanos, Sergio; Buonassisi, Tonio

    2015-10-15

    Silicon wafers comprise approximately 40% of crystalline silicon module cost and represent an area of great technological innovation potential. Paradoxically, unconventional wafer-growth techniques have thus far failed to displace multicrystalline and Czochralski silicon, despite four decades of innovation. One of the shortcomings of most unconventional materials has been a persistent carrier lifetime deficit in comparison to established wafer technologies, which limits the device efficiency potential. In this perspective article, we review a defect-management framework that has proven successful in enabling millisecond lifetimes in kerfless and cast materials. Control of dislocations and slowly diffusing metal point defects during growth, coupled tomore » effective control of fast-diffusing species during cell processing, is critical to enable high cell efficiencies. As a result, to accelerate the pace of novel wafer development, we discuss approaches to rapidly evaluate the device efficiency potential of unconventional wafers from injection-dependent lifetime measurements.« less

  19. Material requirements for the adoption of unconventional silicon crystal and wafer growth techniques for high-efficiency solar cells

    SciTech Connect

    Hofstetter, Jasmin; del Cañizo, Carlos; Wagner, Hannes; Castellanos, Sergio; Buonassisi, Tonio

    2015-10-15

    Silicon wafers comprise approximately 40% of crystalline silicon module cost and represent an area of great technological innovation potential. Paradoxically, unconventional wafer-growth techniques have thus far failed to displace multicrystalline and Czochralski silicon, despite four decades of innovation. One of the shortcomings of most unconventional materials has been a persistent carrier lifetime deficit in comparison to established wafer technologies, which limits the device efficiency potential. In this perspective article, we review a defect-management framework that has proven successful in enabling millisecond lifetimes in kerfless and cast materials. Control of dislocations and slowly diffusing metal point defects during growth, coupled to effective control of fast-diffusing species during cell processing, is critical to enable high cell efficiencies. As a result, to accelerate the pace of novel wafer development, we discuss approaches to rapidly evaluate the device efficiency potential of unconventional wafers from injection-dependent lifetime measurements.

  20. VLSI chip solution for lossless medical imagery compression

    NASA Astrophysics Data System (ADS)

    Venbrux, Jack; Yeh, Pen-Shu; Zweigle, Gregory C.; Vesel, John F.

    1994-05-01

    This paper describes two VLSI implementations that provide an effective solution to compressing medical image data in real time. The implementations employ a lossless data compression algorithm, known as the Rice algorithm. The first chip set was fabricated in 1991. The encoder can compress at 20 Msamples/sec and the decoder decompresses at the rate of 10 Msamples/sec. The chip set is available commercially. The second VLSI chip development is a recently fabricated encoder that provides improvements for coding low entropy data and incorporates features that simplify system integration. A new decoder is scheduled to be designed and fabricated in 1994. The performance of the compression chips on a suite of medical images has been simulated. The image suite includes CT, MR, angiographic images, and nuclear images. In general, the single-pass Rice algorithm compression performance exceeds that of two-pass, lossless, Huffman-based JPEG. The overall compression performance of the Rice algorithm implementations exceeds that of all algorithms tested including arithmetic coding, UNIX compress, UNIX pack, and gzip.

  1. New VLSI complexity results for threshold gate comparison

    SciTech Connect

    Beiu, V.

    1996-12-31

    The paper overviews recent developments concerning optimal (from the point of view of size and depth) implementations of COMPARISON using threshold gates. We detail a class of solutions which also covers another particular solution, and spans from constant to logarithmic depths. These circuit complexity results are supplemented by fresh VLSI complexity results having applications to hardware implementations of neural networks and to VLSI-friendly learning algorithms. In order to estimate the area (A) and the delay (T), as well as the classical AT{sup 2}, we shall use the following {open_quote}cost functions{close_quote}: (i) the connectivity (i.e., sum of fan-ins) and the number-of-bits for representing the weights and thresholds are used as closer approximations of the area; while (ii) the fan-ins and the length of the wires are used for closer estimates of the delay. Such approximations allow us to compare the different solutions-which present very interesting fan-in dependent depth-size and area-delay tradeoffs - with respect to AT{sup 2}.

  2. A fast neural-network algorithm for VLSI cell placement.

    PubMed

    Aykanat, Cevdet; Bultan, Tevfik; Haritaoğlu, Ismail

    1998-12-01

    Cell placement is an important phase of current VLSI circuit design styles such as standard cell, gate array, and Field Programmable Gate Array (FPGA). Although nondeterministic algorithms such as Simulated Annealing (SA) were successful in solving this problem, they are known to be slow. In this paper, a neural network algorithm is proposed that produces solutions as good as SA in substantially less time. This algorithm is based on Mean Field Annealing (MFA) technique, which was successfully applied to various combinatorial optimization problems. A MFA formulation for the cell placement problem is derived which can easily be applied to all VLSI design styles. To demonstrate that the proposed algorithm is applicable in practice, a detailed formulation for the FPGA design style is derived, and the layouts of several benchmark circuits are generated. The performance of the proposed cell placement algorithm is evaluated in comparison with commercial automated circuit design software Xilinx Automatic Place and Route (APR) which uses SA technique. Performance evaluation is conducted using ACM/SIGDA Design Automation benchmark circuits. Experimental results indicate that the proposed MFA algorithm produces comparable results with APR. However, MFA is almost 20 times faster than APR on the average. PMID:12662737

  3. Testing interconnected VLSI circuits in the Big Viterbi Decoder

    NASA Technical Reports Server (NTRS)

    Onyszchuk, I. M.

    1991-01-01

    The Big Viterbi Decoder (BVD) is a powerful error-correcting hardware device for the Deep Space Network (DSN), in support of the Galileo and Comet Rendezvous Asteroid Flyby (CRAF)/Cassini Missions. Recently, a prototype was completed and run successfully at 400,000 or more decoded bits per second. This prototype is a complex digital system whose core arithmetic unit consists of 256 identical very large scale integration (VLSI) gate-array chips, 16 on each of 16 identical boards which are connected through a 28-layer, printed-circuit backplane using 4416 wires. Special techniques were developed for debugging, testing, and locating faults inside individual chips, on boards, and within the entire decoder. The methods are based upon hierarchical structure in the decoder, and require that chips or boards be wired themselves as Viterbi decoders. The basic procedure consists of sending a small set of known, very noisy channel symbols through a decoder, and matching observables against values computed by a software simulation. Also, tests were devised for finding open and short-circuited wires which connect VLSI chips on the boards and through the backplane.

  4. On the VLSI design of a pipeline Reed-Solomon decoder using systolic arrays

    SciTech Connect

    Shao, H.M. ); Reed, I.S. )

    1988-10-01

    A new VLSI design of a pipeline Reed-Solomon decoder is presented. The transform decoding technique used in a previous paper is replaced by a time domain algorithm through a detailed comparison of their VLSI implementations. A new architecture that implements the time domain algorithm permits efficient pipeline processing with reduced circuitry. Erasure correction capability is also incorporated with little additional complexity. By using a multiplexing technique, a new implementation of Euclid's algorithm maintains the throughput rate with less circuitry. Such improvements result in both enhanced capability and significant reduction in silicon area, therefore making it possible to build a pipeline Reed-Solomon decoder on a single VLSI chip.

  5. Modelling deformation and fracture in confectionery wafers

    SciTech Connect

    Mohammed, Idris K.; Charalambides, Maria N.; Williams, J. Gordon; Rasburn, John

    2015-01-22

    The aim of this research is to model the deformation and fracture behaviour of brittle wafers often used in chocolate confectionary products. Three point bending and compression experiments were performed on beam and circular disc samples respectively to determine the 'apparent' stress-strain curves in bending and compression. The deformation of the wafer for both these testing types was observed in-situ within an SEM. The wafer is modeled analytically and numerically as a composite material with a core which is more porous than the skins. X-ray tomography was used to generate a three dimensional volume of the wafer microstructure which was then meshed and used for quantitative analysis. A linear elastic material model, with a damage function and element deletion, was used and the XMT generated architecture was loaded in compression. The output from the FE simulations correlates closely to the load-deflection deformation observed experimentally.

  6. Modelling deformation and fracture in confectionery wafers

    NASA Astrophysics Data System (ADS)

    Mohammed, Idris K.; Charalambides, Maria N.; Williams, J. Gordon; Rasburn, John

    2015-01-01

    The aim of this research is to model the deformation and fracture behaviour of brittle wafers often used in chocolate confectionary products. Three point bending and compression experiments were performed on beam and circular disc samples respectively to determine the 'apparent' stress-strain curves in bending and compression. The deformation of the wafer for both these testing types was observed in-situ within an SEM. The wafer is modeled analytically and numerically as a composite material with a core which is more porous than the skins. X-ray tomography was used to generate a three dimensional volume of the wafer microstructure which was then meshed and used for quantitative analysis. A linear elastic material model, with a damage function and element deletion, was used and the XMT generated architecture was loaded in compression. The output from the FE simulations correlates closely to the load-deflection deformation observed experimentally.

  7. Mask CD uniformity metrology for logic patterning and its correlation to wafer data

    NASA Astrophysics Data System (ADS)

    Le Gratiet, Bertrand; Zékri, Raphaël.; Sundermann, Frank; Trautzsch, Thomas; Thaler, Thomas; Birkner, Robert; Buttgereit, Ute

    2012-06-01

    With the next technology nodes 193nm lithography is pushed to its utmost limits. The industry is forced to print at low k1 factor which goes along with a high MEEF. Additionally, new blank materials are being introduced for smaller nodes. From 4x node and beyond, global CD uniformity on wafer is getting more critical and becomes key factor to ensure a high yield in chip production. Advanced process control is required and correction strategies are applied to maintain tight wafer CD uniformity. Beside other parameters, like scanner and etch process, mask CD uniformity is one main contributor to the intra-field CD on wafer. To enable effective CDU correction strategies it is necessary to establish a mask CD uniformity metrology which shows a good correlation to wafer prints. Especially for logic pattern mask uniformity measurements to control intra-field CD uniformity becomes challenging. In this paper we will focus on mask CD uniformity measurement for logic application utilizing WLCD, which is based on aerial image technology. We will investigate 40nm node and 28nm node gate masks using 6% MoSi phase shifting mask and MoSi binary mask respectively. Furthermore, we will correlate the mask CD uniformity data to wafer data to evaluate the capability of WLCD to predict the intra-field wafer CD uniformity correctly in order to support feedforward correction strategies. We will show that WLCD shows an excellent correlation to wafer data. Additionally, we will provide an outlook on logic contact-hole masks showing first CD uniformity data and wafer correlation data.

  8. Genesis Ultrapure Water Megasonic Wafer Spin Cleaner

    NASA Technical Reports Server (NTRS)

    Allton, Judith H.; Stansbery, Eileen K.; Calaway, Michael J.; Rodriquez, Melissa C.

    2013-01-01

    A device removes, with high precision, the majority of surface particle contamination greater than 1-micron-diameter in size from ultrapure semiconductor wafer materials containing implanted solar wind samples returned by NASA's Genesis mission. This cleaning device uses a 1.5-liter/minute flowing stream of heated ultrapure water (UPW) with 1- MHz oscillating megasonic pulse energy focused at 3 to 5 mm away from the wafer surface spinning at 1,000 to 10,000 RPM, depending on sample size. The surface particle contamination is removed by three processes: flowing UPW, megasonic cavitations, and centripetal force from the spinning wafer. The device can also dry the wafer fragment after UPW/megasonic cleaning by continuing to spin the wafer in the cleaning chamber, which is purged with flowing ultrapure nitrogen gas at 65 psi (.448 kPa). The cleaner also uses three types of vacuum chucks that can accommodate all Genesis-flown array fragments in any dimensional shape between 3 and 100 mm in diameter. A sample vacuum chuck, and the manufactured UPW/megasonic nozzle holder, replace the human deficiencies by maintaining a consistent distance between the nozzle and wafer surface as well as allowing for longer cleaning time. The 3- to 5-mm critical distance is important for the ability to remove particles by megasonic cavitations. The increased UPW sonication time and exposure to heated UPW improve the removal of 1- to 5-micron-sized particles.

  9. Analyzes Data from Semiconductor Wafers

    Energy Science and Technology Software Center (ESTSC)

    2002-07-23

    This program analyzes reflectance data from semiconductor wafers taken during the deposition or evolution of a thin film, typically via chemical vapor deposition (CVD) or molecular beam epitaxy (MBE). It is used to determine the growth rate and optical constants of the deposited thin films using a virtual interface concept. Growth rates and optical constants of multiple-layer structures is possible by selecting appropriate sections in the reflectance vs time waveform. No prior information or estimatesmore » of growth rates and materials properties is required if an absolute reflectance waveform is used. If the optical constants of a thin film are known, then the growth rate may be extracted from a relative reflectance data set. The analysis is valid for either s or p polarized light at any incidence angle and wavelength. The analysis package is contained within an easy-to-use graphical user interface. The program is based on the algorighm described in the following two publications: W.G. Breiland and K.P. Killen, J. Appl. Phys. 78 (1995) 6726, and W. G. Breiland, H.Q. Hou, B.E. Hammons, and J.F. Klem, Proc. XXVIII SOTAPOCS Symp. Electrochem. Soc. San Diego, May 3-8, 1998. It relies on the fact that any multiple-layer system has a reflectance spectrum that is mathematically equivalent to a single-layer thin film on a virtual substrate. The program fits the thin film reflectance with five adjustable parameters: 1) growth rate, 2) real part of complex refractive index, 3) imaginary part of refractive index, 4) amplitude of virtual interface reflectance, 5) phase of virtual interface reflectance.« less

  10. High resolution inspection with wafer plane die: database defect detection

    NASA Astrophysics Data System (ADS)

    Hess, Carl; Wihl, Mark; Shi, Rui-fang; Xiong, Yalin; Pang, Song

    2008-10-01

    High Resolution reticle inspection is well-established as a proven, effective, and efficient means of detecting yieldlimiting mask defects as well as defects which are not immediately yield-limiting yet can enable manufacturing process improvements. Historically, RAPID products have enabled detection of both classes of these defects. The newlydeveloped Wafer Plane Inspection (WPI) detector technology meets the needs of some advanced mask manufacturers to identify the lithographically-significant defects while ignoring the other non-lithographically-significant defects. Wafer Plane Inspection accomplishes this goal by performing defect detection based on a modeled image of how the mask features would actually print in the photoresist. This has the effect of reducing sensitivity to non-printing defects while enabling higher sensitivity focused in high MEEF areas where small reticle defects still yield significant printing defects on wafers. This approach has several important features. The ability to ignore non-printing defects and to apply additional effective sensitivity in high MEEF areas enables advanced node development. In addition, the modeling allows the inclusion of important polarization effects that occur in the resist for high NA operation. This allows for the results to better match wafer print results compared to alternate approaches. Finally, the simulation easily allows for the application of arbitrary illumination profiles. With this approach, users of WPI can make use of unique or custom scanner illumination profiles. This allows the more precise modeling of profiles without inspection system hardware modification or loss of company intellectual property. A previous paper [1] introduced WPI in D:D mode. This paper examines the operation and results for WPI in Die:Database mode.

  11. Parallel VLSI architecture emulation and the organization of APSA/MPP

    NASA Technical Reports Server (NTRS)

    Odonnell, John T.

    1987-01-01

    The Applicative Programming System Architecture (APSA) combines an applicative language interpreter with a novel parallel computer architecture that is well suited for Very Large Scale Integration (VLSI) implementation. The Massively Parallel Processor (MPP) can simulate VLSI circuits by allocating one processing element in its square array to an area on a square VLSI chip. As long as there are not too many long data paths, the MPP can simulate a VLSI clock cycle very rapidly. The APSA circuit contains a binary tree with a few long paths and many short ones. A skewed H-tree layout allows every processing element to simulate a leaf cell and up to four tree nodes, with no loss in parallelism. Emulation of a key APSA algorithm on the MPP resulted in performance 16,000 times faster than a Vax. This speed will make it possible for the APSA language interpreter to run fast enough to support research in parallel list processing algorithms.

  12. The VLSI design of a single chip Reed-Solomon encoder

    NASA Technical Reports Server (NTRS)

    Truong, T. K.; Deutsch, L. J.; Reed, I. S.

    1982-01-01

    A design for a single chip implementation of a Reed-Solomon encoder is presented. The architecture that leads to this single VLSI chip design makes use of a bit serial finite field multiplication algorithm.

  13. Concepts for on-board satellite image registration. Volume 3: Impact of VLSI/VHSIC on satellite on-board signal processing

    NASA Technical Reports Server (NTRS)

    Aanstoos, J. V.; Snyder, W. E.

    1981-01-01

    Anticipated major advances in integrated circuit technology in the near future are described as well as their impact on satellite onboard signal processing systems. Dramatic improvements in chip density, speed, power consumption, and system reliability are expected from very large scale integration. Improvements are expected from very large scale integration enable more intelligence to be placed on remote sensing platforms in space, meeting the goals of NASA's information adaptive system concept, a major component of the NASA End-to-End Data System program. A forecast of VLSI technological advances is presented, including a description of the Defense Department's very high speed integrated circuit program, a seven-year research and development effort.

  14. Concepts for on-board satellite image registration. Volume 3: Impact of VLSI/VHSIC on satellite on-board signal processing

    NASA Astrophysics Data System (ADS)

    Aanstoos, J. V.; Snyder, W. E.

    1981-07-01

    Anticipated major advances in integrated circuit technology in the near future are described as well as their impact on satellite onboard signal processing systems. Dramatic improvements in chip density, speed, power consumption, and system reliability are expected from very large scale integration. Improvements are expected from very large scale integration enable more intelligence to be placed on remote sensing platforms in space, meeting the goals of NASA's information adaptive system concept, a major component of the NASA End-to-End Data System program. A forecast of VLSI technological advances is presented, including a description of the Defense Department's very high speed integrated circuit program, a seven-year research and development effort.

  15. Porous solid ion exchange wafer for immobilizing biomolecules

    DOEpatents

    Arora, Michelle B.; Hestekin, Jamie A.; Lin, YuPo J.; St. Martin, Edward J.; Snyder, Seth W.

    2007-12-11

    A porous solid ion exchange wafer having a combination of a biomolecule capture-resin and an ion-exchange resin forming a charged capture resin within said wafer. Also disclosed is a porous solid ion exchange wafer having a combination of a biomolecule capture-resin and an ion-exchange resin forming a charged capture resin within said wafer containing a biomolecule with a tag. A separate bioreactor is also disclosed incorporating the wafer described above.

  16. Improvement of focus accuracy on processed wafer

    NASA Astrophysics Data System (ADS)

    Higashibata, Satomi; Komine, Nobuhiro; Fukuhara, Kazuya; Koike, Takashi; Kato, Yoshimitsu; Hashimoto, Kohji

    2013-04-01

    As feature size shrinkage in semiconductor device progress, process fluctuation, especially focus strongly affects device performance. Because focus control is an ongoing challenge in optical lithography, various studies have sought for improving focus monitoring and control. Focus errors are due to wafers, exposure tools, reticles, QCs, and so on. Few studies are performed to minimize the measurement errors of auto focus (AF) sensors of exposure tool, especially when processed wafers are exposed. With current focus measurement techniques, the phase shift grating (PSG) focus monitor 1) has been already proposed and its basic principle is that the intensity of the diffraction light of the mask pattern is made asymmetric by arranging a π/2 phase shift area on a reticle. The resist pattern exposed at the defocus position is shifted on the wafer and shifted pattern can be easily measured using an overlay inspection tool. However, it is difficult to measure shifted pattern for the pattern on the processed wafer because of interruptions caused by other patterns in the underlayer. In this paper, we therefore propose "SEM-PSG" technique, where the shift of the PSG resist mark is measured by employing critical dimension-scanning electron microscope (CD-SEM) to measure the focus error on the processed wafer. First, we evaluate the accuracy of SEM-PSG technique. Second, by applying the SEM-PSG technique and feeding the results back to the exposure, we evaluate the focus accuracy on processed wafers. By applying SEM-PSG feedback, the focus accuracy on the processed wafer was improved from 40 to 29 nm in 3σ.

  17. Novel on chip-interconnection structures for giga-scale integration VLSI ICS

    NASA Astrophysics Data System (ADS)

    Nelakuditi, Usha R.; Reddy, S. N.

    2013-01-01

    Based on the guidelines of International Technology Roadmap for Semiconductors (ITRS) Intel has already designed and manufactured the next generation product of the Itanium family containing 1.72 billion transistors. In each new technology due to scaling, individual transistors are becoming smaller and faster, and are dissipating low power. The main challenge with these systems is wiring of these billion transistors since wire length interconnect scaling increases the distributed resistance-capacitance product. In addition, high clock frequencies necessitate reverse scaling of global and semi-global interconnects so that they satisfy the timing constraints. Hence, the performances of future GSI systems will be severely restricted by interconnect performance. It is therefore essential to look at interconnect design techniques that will reduce the impact of interconnect networks on the power, performance and cost of the entire system. In this paper a new routing technique called Wave-Pipelined Multiplexed (WPM) Routing similar to Time Division Multiple Access (TDMA) is discussed. This technique is highly useful for the current high density CMOS VLSI ICs. The major advantages of WPM routing technique are flexible, robust, simple to implement, and realized with low area, low power and performance overhead requirements.

  18. VLSI-based Video Event Triggering for Image Data Compression

    NASA Technical Reports Server (NTRS)

    Williams, Glenn L.

    1994-01-01

    Long-duration, on-orbit microgravity experiments require a combination of high resolution and high frame rate video data acquisition. The digitized high-rate video stream presents a difficult data storage problem. Data produced at rates of several hundred million bytes per second may require a total mission video data storage requirement exceeding one terabyte. A NASA-designed, VLSI-based, highly parallel digital state machine generates a digital trigger signal at the onset of a video event. High capacity random access memory storage coupled with newly available fuzzy logic devices permits the monitoring of a video image stream for long term (DC-like) or short term (AC-like) changes caused by spatial translation, dilation, appearance, disappearance, or color change in a video object. Pre-trigger and post-trigger storage techniques are then adaptable to archiving only the significant video images.

  19. VLSI-based video event triggering for image data compression

    NASA Astrophysics Data System (ADS)

    Williams, Glenn L.

    1994-02-01

    Long-duration, on-orbit microgravity experiments require a combination of high resolution and high frame rate video data acquisition. The digitized high-rate video stream presents a difficult data storage problem. Data produced at rates of several hundred million bytes per second may require a total mission video data storage requirement exceeding one terabyte. A NASA-designed, VLSI-based, highly parallel digital state machine generates a digital trigger signal at the onset of a video event. High capacity random access memory storage coupled with newly available fuzzy logic devices permits the monitoring of a video image stream for long term (DC-like) or short term (AC-like) changes caused by spatial translation, dilation, appearance, disappearance, or color change in a video object. Pre-trigger and post-trigger storage techniques are then adaptable to archiving only the significant video images.

  20. Modeling selective attention using a neuromorphic analog VLSI device.

    PubMed

    Indiveri, G

    2000-12-01

    Attentional mechanisms are required to overcome the problem of flooding a limited processing capacity system with information. They are present in biological sensory systems and can be a useful engineering tool for artificial visual systems. In this article we present a hardware model of a selective attention mechanism implemented on a very large-scale integration (VLSI) chip, using analog neuromorphic circuits. The chip exploits a spike-based representation to receive, process, and transmit signals. It can be used as a transceiver module for building multichip neuromorphic vision systems. We describe the circuits that carry out the main processing stages of the selective attention mechanism and provide experimental data for each circuit. We demonstrate the expected behavior of the model at the system level by stimulating the chip with both artificially generated control signals and signals obtained from a saliency map, computed from an image containing several salient features. PMID:11112258

  1. Event-driven neural integration and synchronicity in analog VLSI.

    PubMed

    Yu, Theodore; Park, Jongkil; Joshi, Siddharth; Maier, Christoph; Cauwenberghs, Gert

    2012-01-01

    Synchrony and temporal coding in the central nervous system, as the source of local field potentials and complex neural dynamics, arises from precise timing relationships between spike action population events across neuronal assemblies. Recently it has been shown that coincidence detection based on spike event timing also presents a robust neural code invariant to additive incoherent noise from desynchronized and unrelated inputs. We present spike-based coincidence detection using integrate-and-fire neural membrane dynamics along with pooled conductance-based synaptic dynamics in a hierarchical address-event architecture. Within this architecture, we encode each synaptic event with parameters that govern synaptic connectivity, synaptic strength, and axonal delay with additional global configurable parameters that govern neural and synaptic temporal dynamics. Spike-based coincidence detection is observed and analyzed in measurements on a log-domain analog VLSI implementation of the integrate-and-fire neuron and conductance-based synapse dynamics. PMID:23366007

  2. On-chip learning with analogue VLSI neural networks.

    PubMed

    Tarassenko, L; Tombs, J; Cairns, G

    1993-12-01

    Results from simulations of weight perturbation as an on-chip learning scheme for analogue VLSI neural networks are presented. The limitations of analogue hardware are modelled as realistically as possible. Thus synaptic weight precision is defined according to the smallest change in the weight setting voltage which gives a measurable change at the output of the corresponding neuron. Tests are carried out on a hard classification problem constructed from mobile robot navigation data. The simulations show that the degradation in classification performance on a 500-pattern test set caused by the introduction of realistic hardware constraints is acceptable: with 8-bit weights, updated probabilistically and with a simplified output error criterion, the error rate increases by no more than 7% when compared with weight perturbation implemented with full 32-bit precision. PMID:8049803

  3. Rule-based circuit optimization for CMOS VLSI

    SciTech Connect

    Lai, F.

    1987-01-01

    A closed-loop design system iJADE was developed in Franz LISP. iJADE is a hierarchical CMOS VLSI circuit optimizer. Using a switch-level timing simulator and a timing analyzer, the program pinpoints the critical paths. The path-delay reduction algorithms and a rule-based expert system are then applied to adjust transistor sizes such that the speed of the circuit can be improved while keeping constraints satisfied. iJADE is also capable of detecting and correcting the timing errors of synchronous circuits. The circuit is described in SPICE-like input format, and then partitioned into blocks. Delays are computed on a block-by-block basis hierarchically, using a simple model based on input rise time, block type, and output load.

  4. Very large scale integration (VLSI) architectures for video signal processing

    NASA Astrophysics Data System (ADS)

    Pirsch, Peter; Gehrke, Winfried

    1995-04-01

    The paper presents an overview on architectures for VLSI implementations of video compression schemes as specified by standardization committees of the ITU and ISO, focussing on programmable architectures. Programmable video signal processors are classified and specified as homogeneous and heterogeneous processor architectures. Architectures are presented for reported design examples for the literature. Heterogenous processors outperform homogeneous processors because of adaptation to the requirements of special subtasks by dedicated modules. The majority of heterogenous processors incorporate dedicated modules for high performance subtasks of high regularity as DCT and block matching. By normalization to a fictive 1.0 micron CMOS process typical linear relationships between silicon area and through-put rate have been determined for the different architectural styles. This relationship indicated a figure of merit for silicon efficiency.

  5. Distributed predetection of moving point targets with analog VLSI

    NASA Astrophysics Data System (ADS)

    Bartolac, Thomas J.

    1992-07-01

    When large-field IR sensors are quite distant from the scene, targets appear as points, so detection is based on their motion, rather than their structure. The appearance of background and clutter bright points, although eventually rejected as nontargets, unnecessarily burdens tracking algorithms. Typical approaches involve eliminating background prior to tracking, or only looking within dynamic search boxes based on previous-frame target observations. This presentation describes a method for distributed predetection of points due to moving targets, in which background points are be automatically rejected, and only those detector returns that are most likely to be from targets are be provided to the tracking algorithm. The paper discusses the retinally inspired concepts behind the proposed method, analytical and empirical evaluations of its performance, and a hardware implementation based on Mead's (1989) analog VLSI circuits, resulting in a fine-grained-parallel architecture suitable for on-focal-plane applications.

  6. Thin, High Lifetime Silicon Wafers with No Sawing; Re-crystallization in a Thin Film Capsule

    SciTech Connect

    Emanuel Sachs Tonio Buonassisi

    2013-01-16

    The project fits within the area of renewable energy called photovoltaics (PV), or the generation of electricity directly from sunlight using semiconductor devices. PV has the greatest potential of any renewable energy technology. The vast majority of photovoltaic modules are made on crystalline silicon wafers and these wafers accounts for the largest fraction of the cost of a photovoltaic module. Thus, a method of making high quality, low cost wafers would be extremely beneficial to the PV industry The industry standard technology creates wafers by casting an ingot and then sawing wafers from the ingot. Sawing rendered half of the highly refined silicon feedstock as un-reclaimable dust. Being a brittle material, the sawing is actually a type of grinding operation which is costly both in terms of capital equipment and in terms of consumables costs. The consumables costs associated with the wire sawing technology are particularly burdensome and include the cost of the wire itself (continuously fed, one time use), the abrasive particles, and, waste disposal. The goal of this project was to make wafers directly from molten silicon with no sawing required. The fundamental concept was to create a very low cost (but low quality) wafer of the desired shape and size and then to improve the quality of the wafer by a specialized thermal treatment (called re-crystallization). Others have attempted to create silicon sheet by recrystallization with varying degrees of success. Key among the difficulties encountered by others were: a) difficulty in maintaining the physical shape of the sheet during the recrystallization process and b) difficulty in maintaining the cleanliness of the sheet during recrystallization. Our method solved both of these challenges by encapsulating the preform wafer in a protective capsule prior to recrystallization (see below). The recrystallization method developed in this work was extremely effective at maintaining the shape and the cleanliness of the

  7. Detection of Metal Contamination on Silicon Wafer Backside and Edge by New TXRF Methods

    NASA Astrophysics Data System (ADS)

    Kohno, Hiroshi; Yamagami, Motoyuki; Formica, Joseph; Shen, Liyong

    2009-09-01

    In conventional 200 mm wafer processing, backside defects are not considered to be of much concern because they are obscured by wafer backside topography. However, in current 300 mm wafer processing where both sides of a wafer are polished, backside defects require more consideration. In the beginning, backside defect inspection examined particle contamination because particle contamination adversely influences the depth of field in lithography. Recently, metal contamination is of concern because backside metal contamination causes cross-contamination in a process line, and backside metals easily transfer to the front surface. As the industry strives to yield more devices from the area around the wafer edge, edge exclusion requirements have also become more important. The current International Technology Roadmap for Semiconductors [1] requires a 2 mm edge exclusion. Therefore, metal contamination must be controlled to less than 2 mm from the edge because metal contamination easily diffuses in silicon wafers. To meet these current semiconductor processing requirements, newly developed zero edge exclusion TXRF (ZEE-TXRF) and backside measurement TXRF (BAC-TXRF) are effective metrology methods.

  8. A front-end wafer-level microsystem packaging technique with micro-cap array

    NASA Astrophysics Data System (ADS)

    Chiang, Yuh-Min

    2002-09-01

    The back-end packaging process is the remaining challenge for the micromachining industry to commercialize microsystem technology (MST) devices at low cost. This dissertation presents a novel wafer level protection technique as a final step of the front-end fabrication process for MSTs. It facilitates improved manufacturing throughput and automation in package assembly, wafer level testing of devices, and enhanced device performance. The method involves the use of a wafer-sized micro-cap array, which consists of an assortment of small caps micro-molded onto a material with adjustable shapes and sizes to serve as protective structures against the hostile environments during packaging. The micro-cap array is first constructed by a micromachining process with micro-molding technique, then sealed to the device wafer at wafer level. Epoxy-based wafer-level micro cap array has been successfully fabricated and showed good compatibility with conventional back-end packaging processes. An adhesive transfer technique was demonstrated to seal the micro cap array with a MEMS device wafer. No damage or gross leak was observed while wafer dicing or later during a gross leak test. Applications of the micro cap array are demonstrated on MEMS, microactuators fabricated using CRONOS MUMPS process. Depending on the application needs, the micro-molded cap can be designed and modified to facilitate additional component functions, such as optical, electrical, mechanical, and chemical functions, which are not easily achieved in the device by traditional means. Successful fabrication of a micro cap array comprised with microlenses can provide active functions as well as passive protection. An optical tweezer array could be one possibility for applications of a micro cap with microlenses. The micro cap itself could serve as micro well for DNA or bacteria amplification as well.

  9. Wafer-fused semiconductor radiation detector

    DOEpatents

    Lee, Edwin Y.; James, Ralph B.

    2002-01-01

    Wafer-fused semiconductor radiation detector useful for gamma-ray and x-ray spectrometers and imaging systems. The detector is fabricated using wafer fusion to insert an electrically conductive grid, typically comprising a metal, between two solid semiconductor pieces, one having a cathode (negative electrode) and the other having an anode (positive electrode). The wafer fused semiconductor radiation detector functions like the commonly used Frisch grid radiation detector, in which an electrically conductive grid is inserted in high vacuum between the cathode and the anode. The wafer-fused semiconductor radiation detector can be fabricated using the same or two different semiconductor materials of different sizes and of the same or different thicknesses; and it may utilize a wide range of metals, or other electrically conducting materials, to form the grid, to optimize the detector performance, without being constrained by structural dissimilarity of the individual parts. The wafer-fused detector is basically formed, for example, by etching spaced grooves across one end of one of two pieces of semiconductor materials, partially filling the grooves with a selected electrical conductor which forms a grid electrode, and then fusing the grooved end of the one semiconductor piece to an end of the other semiconductor piece with a cathode and an anode being formed on opposite ends of the semiconductor pieces.

  10. Silicon Wafer-Scale Substrate for Microshutters and Detector Arrays

    NASA Technical Reports Server (NTRS)

    Jhabvala, Murzy; Franz, David E.; Ewin, Audrey J.; Jhabvala, Christine; Babu, Sachi; Snodgrass, Stephen; Costen, Nicholas; Zincke, Christian

    2009-01-01

    The silicon substrate carrier was created so that a large-area array (in this case 62,000+ elements of a microshutter array) and a variety of discrete passive and active devices could be mounted on a single board, similar to a printed circuit board. However, the density and number of interconnects far exceeds the capabilities of printed circuit board technology. To overcome this hurdle, a method was developed to fabricate this carrier out of silicon and implement silicon integrated circuit (IC) technology. This method achieves a large number of high-density metal interconnects; a 100-percent yield over a 6-in. (approximately equal to 15-cm) diameter wafer (one unit per wafer); a rigid, thermally compatible structure (all components and operating conditions) to cryogenic temperatures; re-workability and component replaceability, if required; and the ability to precisely cut large-area holes through the substrate. A method that would employ indium bump technology along with wafer-scale integration onto a silicon carrier was also developed. By establishing a silicon-based version of a printed circuit board, the objectives could be met with one solution. The silicon substrate would be 2 mm thick to survive the environmental loads of a launch. More than 2,300 metal traces and over 1,500 individual wire bonds are required. To mate the microshutter array to the silicon substrate, more than 10,000 indium bumps are required. A window was cut in the substrate to allow the light signal to pass through the substrate and reach the microshutter array. The substrate was also the receptacle for multiple unpackaged IC die wire-bonded directly to the substrate (thus conserving space over conventionally packaged die). Unique features of this technology include the implementation of a 2-mmthick silicon wafer to withstand extreme mechanical loads (from a rocket launch); integrated polysilicon resistor heaters directly on the substrate; the precise formation of an open aperture

  11. Environmentally benign processing of YAG transparent wafers

    NASA Astrophysics Data System (ADS)

    Yang, Yan; Wu, Yiquan

    2015-12-01

    Transparent yttrium aluminum garnet (YAG) wafers were successfully produced via aqueous tape casting and vacuum sintering techniques using a new environmentally friendly binder, a copolymer of isobutylene and maleic anhydride with the commercial name ISOBAM (noted as ISOBAM). Aqueous YAG slurries were mixed by ball-milling, which was followed by de-gassing and tape casting of wafers. The final YAG green tapes were homogenous and flexible, and could be bent freely without cracking. After the drying and sintering processes, transparent YAG wafers were achieved. The microstructures of both the green tape and vacuum-sintered YAG ceramic were observed by scanning electronic microscopy (SEM). Phase compositions were examined by X-ray diffraction (XRD). Optical transmittance was measured in UV-VIS regions with the result that the transmittance is 82.6% at a wavelength of 800 nm.

  12. Making Porous Luminescent Regions In Silicon Wafers

    NASA Technical Reports Server (NTRS)

    Fathauer, Robert W.; Jones, Eric W.

    1994-01-01

    Regions damaged by ion implantation stain-etched. Porous regions within single-crystal silicon wafers fabricated by straightforward stain-etching process. Regions exhibit visible photoluminescence at room temperature and might constitute basis of novel class of optoelectronic devices. Stain-etching process has advantages over recently investigated anodic-etching process. Process works on both n-doped and p-doped silicon wafers. Related development reported in article, "Porous Si(x)Ge(1-x) Layers Within Single Crystals of Si," (NPO-18836).

  13. Laser furnace and method for zone refining of semiconductor wafers

    NASA Technical Reports Server (NTRS)

    Griner, Donald B. (Inventor); zur Burg, Frederick W. (Inventor); Penn, Wayne M. (Inventor)

    1988-01-01

    A method of zone refining a crystal wafer (116 FIG. 1) comprising the steps of focusing a laser beam to a small spot (120) of selectable size on the surface of the crystal wafer (116) to melt a spot on the crystal wafer, scanning the small laser beam spot back and forth across the surface of the crystal wafer (116) at a constant velocity, and moving the scanning laser beam across a predetermined zone of the surface of the crystal wafer (116) in a direction normal to the laser beam scanning direction and at a selectible velocity to melt and refine the entire crystal wafer (116).

  14. Testability of VLSI (Very Large Scale Integration) leakage faults in CMOS (Complementary Metal Oxide Semiconductor)

    NASA Astrophysics Data System (ADS)

    Malaiya, Y. K.; Su, S. Y. H.

    1983-09-01

    With the advent of VLSI (Very Large Scale Integration), the importance of CMOS (Complementary Metal Oxide Semiconductor) technology has increased. CMOS offers some very significant advantages over NMOS, and has emerged very competitive. Therefore, testability of CMOS devices is of considerable importance. CMOS devices exhibit some failure modes which are not adequately represented by the classical stuck-at fault model. A new fault model is introduced here to represent such faults. Leakage faults are specifically examined in this report, such faults increase the static supply current (which is ordinarily quite low) substantially. A leakage testing experiment consists of applying different vectors to the circuit, and in each case measuring the static supply current. This experimentally obtained data is then analyzed to obtain fault-related information. Leakage testing offers extra testability without any additional pins. It can detect some faults which cannot be detected by the conventional testing. Test generation for several basic CMOS structures is considered. Correspondence between leakage testing and conventional testing is studied. Two methods for analyzing experimental data are presented. Available experimental data was analyzed to obtain statistical information.

  15. Emergent Auditory Feature Tuning in a Real-Time Neuromorphic VLSI System

    PubMed Central

    Sheik, Sadique; Coath, Martin; Indiveri, Giacomo; Denham, Susan L.; Wennekers, Thomas; Chicca, Elisabetta

    2011-01-01

    Many sounds of ecological importance, such as communication calls, are characterized by time-varying spectra. However, most neuromorphic auditory models to date have focused on distinguishing mainly static patterns, under the assumption that dynamic patterns can be learned as sequences of static ones. In contrast, the emergence of dynamic feature sensitivity through exposure to formative stimuli has been recently modeled in a network of spiking neurons based on the thalamo-cortical architecture. The proposed network models the effect of lateral and recurrent connections between cortical layers, distance-dependent axonal transmission delays, and learning in the form of Spike Timing Dependent Plasticity (STDP), which effects stimulus-driven changes in the pattern of network connectivity. In this paper we demonstrate how these principles can be efficiently implemented in neuromorphic hardware. In doing so we address two principle problems in the design of neuromorphic systems: real-time event-based asynchronous communication in multi-chip systems, and the realization in hybrid analog/digital VLSI technology of neural computational principles that we propose underlie plasticity in neural processing of dynamic stimuli. The result is a hardware neural network that learns in real-time and shows preferential responses, after exposure, to stimuli exhibiting particular spectro-temporal patterns. The availability of hardware on which the model can be implemented, makes this a significant step toward the development of adaptive, neurobiologically plausible, spike-based, artificial sensory systems. PMID:22347163

  16. Wafer-to-wafer bonding of nonplanarized MEMS surfaces using solder

    NASA Astrophysics Data System (ADS)

    Sparks, D.; Queen, G.; Weston, R.; Woodward, G.; Putty, M.; Jordan, L.; Zarabadi, S.; Jayakar, K.

    2001-11-01

    The fabrication and reliability of a solder wafer-to-wafer bonding process is discussed. Using a solder reflow process allows vacuum packaging to be accomplished with unplanarized complementary metal-oxide semiconductor (CMOS) surface topography. This capability enables standard CMOS processes, and integrated microelectromechanical systems devices to be packaged at the chip-level. Alloy variations give this process the ability to bond at lower temperatures than most alternatives. Factors affecting hermeticity, shorts, Q values, shifting cavity pressure, wafer saw cleanliness and corrosion resistance will be covered.

  17. VLSI processor with a configurable processing element array for balanced feature extraction in high-resolution images

    NASA Astrophysics Data System (ADS)

    Zhu, Hongbo; Shibata, Tadashi

    2014-01-01

    A VLSI processor employing a configurable processing element array (PEA) is developed for a newly proposed balanced feature extraction algorithm. In the algorithm, the input image is divided into square regions and the number of features is determined by noise effect analysis in each region. Regions of different sizes are used according to the resolutions and contents of input images. Therefore, inside the PEA, processing elements are hierarchically grouped for feature extraction in regions of different sizes. A proof-of-concept chip is fabricated using a 0.18 µm CMOS technology with a 32 × 32 PEA. From measurement results, a speed of 7.5 kfps is achieved for feature extraction in 128 × 128 pixel regions when operating the chip at 45 MHz, and a speed of 55 fps is also achieved for feature extraction in 1920 × 1080 pixel images.

  18. Effect of wafer geometry on lithography chucking processes

    NASA Astrophysics Data System (ADS)

    Turner, Kevin T.; Sinha, Jaydeep K.

    2015-03-01

    Wafer flatness during exposure in lithography tools is critical and is becoming more important as feature sizes in devices shrink. While chucks are used to support and flatten the wafer during exposure, it is essential that wafer geometry be controlled as well. Thickness variations of the wafer and high-frequency wafer shape components can lead to poor flatness of the chucked wafer and ultimately patterning problems, such as defocus errors. The objective of this work is to understand how process-induced wafer geometry, resulting from deposited films with non-uniform stress, can lead to high-frequency wafer shape variations that prevent complete chucking in lithography scanners. In this paper, we discuss both the acceptable limits of wafer shape that permit complete chucking to be achieved, and how non-uniform residual stresses in films, either due to patterning or process non-uniformity, can induce high spatial frequency wafer shape components that prevent chucking. This paper describes mechanics models that relate non-uniform film stress to wafer shape and presents results for two example cases. The models and results can be used as a basis for establishing control strategies for managing process-induced wafer geometry in order to avoid wafer flatness-induced errors in lithography processes.

  19. Emulated muscle spindle and spiking afferents validates VLSI neuromorphic hardware as a testbed for sensorimotor function and disease

    PubMed Central

    Niu, Chuanxin M.; Nandyala, Sirish K.; Sanger, Terence D.

    2014-01-01

    The lack of multi-scale empirical measurements (e.g., recording simultaneously from neurons, muscles, whole body, etc.) complicates understanding of sensorimotor function in humans. This is particularly true for the understanding of development during childhood, which requires evaluation of measurements over many years. We have developed a synthetic platform for emulating multi-scale activity of the vertebrate sensorimotor system. Our design benefits from Very Large Scale Integrated-circuit (VLSI) technology to provide considerable scalability and high-speed, as much as 365× faster than real-time. An essential component of our design is the proprioceptive sensor, or muscle spindle. Here we demonstrate an accurate and extremely fast emulation of a muscle spindle and its spiking afferents, which are computationally expensive but fundamental for reflex functions. We implemented a well-known rate-based model of the spindle (Mileusnic et al., 2006) and a simplified spiking sensory neuron model using the Izhikevich approximation to the Hodgkin–Huxley model. The resulting behavior of our afferent sensory system is qualitatively compatible with classic cat soleus recording (Crowe and Matthews, 1964b; Matthews, 1964, 1972). Our results suggest that this simplified structure of the spindle and afferent neuron is sufficient to produce physiologically-realistic behavior. The VLSI technology allows us to accelerate this behavior beyond 365× real-time. Our goal is to use this testbed for predicting years of disease progression with only a few days of emulation. This is the first hardware emulation of the spindle afferent system, and it may have application not only for emulation of human health and disease, but also for the construction of compliant neuromorphic robotic systems. PMID:25538613

  20. Apparatus for edge etching of semiconductor wafers

    NASA Technical Reports Server (NTRS)

    Casajus, A.

    1986-01-01

    A device for use in the production of semiconductors, characterized by etching in a rapidly rotating etching bath is described. The fast rotation causes the surface of the etching bath to assume the form of a paraboloid of revolution, so that the semiconductor wafer adjusted at a given height above the resting bath surface is only attacked by etchant at the edges.

  1. Methanol Steam Reformer on a Silicon Wafer

    SciTech Connect

    Park, H; Malen, J; Piggott, T; Morse, J; Sopchak, D; Greif, R; Grigoropoulos, C; Havstad, M; Upadhye, R

    2004-04-15

    A study of the reforming rates, heat transfer and flow through a methanol reforming catalytic microreactor fabricated on a silicon wafer are presented. Comparison of computed and measured conversion efficiencies are shown to be favorable. Concepts for insulating the reactor while maintaining small overall size and starting operation from ambient temperature are analyzed.

  2. Silicon Alignment Pins: An Easy Way to Realize a Wafer-to-Wafer Alignment

    NASA Technical Reports Server (NTRS)

    Jung-Kubiak, Cecile; Reck, Theodore J.; Lin, Robert H.; Peralta, Alejandro; Gill, John J.; Lee, Choonsup; Siles, Jose; Toda, Risaku; Chattopadhyay, Goutam; Cooper, Ken B.; Mehdi, Imran; Thomas, Bertrand

    2013-01-01

    Submillimeter heterodyne instruments play a critical role in addressing fundamental questions regarding the evolution of galaxies as well as being a crucial tool in planetary science. To make these instruments compatible with small platforms, especially for the study of the outer planets, or to enable the development of multi-pixel arrays, it is essential to reduce the mass, power, and volume of the existing single-pixel heterodyne receivers. Silicon micromachining technology is naturally suited for making these submillimeter and terahertz components, where precision and accuracy are essential. Waveguide and channel cavities are etched in a silicon bulk material using deep reactive ion etching (DRIE) techniques. Power amplifiers, multiplier and mixer chips are then integrated and the silicon pieces are stacked together to form a supercompact receiver front end. By using silicon micromachined packages for these components, instrument mass can be reduced and higher levels of integration can be achieved. A method is needed to assemble accurately these silicon pieces together, and a technique was developed here using etched pockets and silicon pins to align two wafers together.

  3. Advanced technologies for Mission Control Centers

    NASA Technical Reports Server (NTRS)

    Dalton, John T.; Hughes, Peter M.

    1991-01-01

    Advance technologies for Mission Control Centers are presented in the form of the viewgraphs. The following subject areas are covered: technology needs; current technology efforts at GSFC (human-machine interface development, object oriented software development, expert systems, knowledge-based software engineering environments, and high performance VLSI telemetry systems); and test beds.

  4. Adaptive WTA with an analog VLSI neuromorphic learning chip.

    PubMed

    Häfliger, Philipp

    2007-03-01

    In this paper, we demonstrate how a particular spike-based learning rule (where exact temporal relations between input and output spikes of a spiking model neuron determine the changes of the synaptic weights) can be tuned to express rate-based classical Hebbian learning behavior (where the average input and output spike rates are sufficient to describe the synaptic changes). This shift in behavior is controlled by the input statistic and by a single time constant. The learning rule has been implemented in a neuromorphic very large scale integration (VLSI) chip as part of a neurally inspired spike signal image processing system. The latter is the result of the European Union research project Convolution AER Vision Architecture for Real-Time (CAVIAR). Since it is implemented as a spike-based learning rule (which is most convenient in the overall spike-based system), even if it is tuned to show rate behavior, no explicit long-term average signals are computed on the chip. We show the rule's rate-based Hebbian learning ability in a classification task in both simulation and chip experiment, first with artificial stimuli and then with sensor input from the CAVIAR system. PMID:17385639

  5. A VLSI decomposition of the deBruijn graph

    NASA Technical Reports Server (NTRS)

    Collins, O.; Dolinar, S.; Mceliece, R.; Pollara, F.

    1990-01-01

    A new Viterbi decoder for convolutional codes with constraint lengths up to 15, called the Big Viterbi Decoder, is under development for the Deep Space Network. It will be demonstrated by decoding data from the Galileo spacecraft, which has a rate 1/4, constraint-length 15 convolutional encoder on board. Here, the mathematical theory underlying the design of the very-large-scale-integrated (VLSI) chips that are being used to build this decoder is explained. The deBruijn graph B sub n describes the topology of a fully parallel, rate 1/v, constraint length n+2 Viterbi decoder, and it is shown that B sub n can be built by appropriately wiring together (i.e., connecting together with extra edges) many isomorphic copies of a fixed graph called a B sub n building block. The efficiency of such a building block is defined as the fraction of the edges in B sub n that are present in the copies of the building block. It is shown, among other things, that for any alpha less than 1, there exists a graph G which is a B sub n building block of efficiency greater than alpha for all sufficiently large n. These results are illustrated by describing a special hierarchical family of deBruijn building blocks, which has led to the design of the gate-array chips being used in the Big Viterbi Decoder.

  6. VLSI array processor R&D status report

    NASA Astrophysics Data System (ADS)

    Greenwood, E.

    1982-01-01

    Detail design of the Arithmetic Processor Unit (APU) chip has been completed. All cell types (100) have been run through the design rule check (DRC) programs, corrected and verified. DRC runs on the entire chip have been run and all corrections have been made. Fifteen out of eighteen of the chip DRC corrections have been verified. The metal, polysilicon and information data layers of the APU layout is shown. The attached drawings, titled 'VLSI Array Processor Arithmetic Processor Unit Chip Plan' is a detail drawing of the APU Chip Plan. The functional level simulator of the APU has been built and verified using a set of APU diagnostic code. A gate level logic simulation of the APU has been built. The APU breadboard modules have been fabricated and check out has been initiated. The Array Processor Demonstration System (APDS) modules are in the wire-wrap process. The APDS and APU microcode assembler have been built and checked out. The linker and loader for the APDS have also been built.

  7. Method to reduce particles and defects on unprocessed wafers caused by clusterization and cross contamination from processed wafers

    NASA Astrophysics Data System (ADS)

    Sant, Sanket

    2012-10-01

    One of the leading problems in the semiconductor industry with device scaling is defects and particles. Of this the most important ones are particles that can clusterize (condensate) with exposure to atmosphere. These clusters can be formed by residual halides or halide structures on the wafer surface reacting with surface moisture which is unavoidable. Such clusters can prove detrimental to the processed wafer, but more interestingly can migrate inside the FOUP onto unetched wafers. This migration of clusters can cause micro masking and other defects when these wafers are processed. This reduces the wafer yield and is challenging to resolve as we move towards smaller nodes. In this work, different methods of eliminating cross condensation defects and avoiding cluster formation on processed wafers are discussed. UV, Ozone and heat are the primary candidates explored and the mechanism behind each method is explored and optimized. Impact of each mechanism on wafer yield, part corrosion in a reactor platform and wafer throughput has been studied.

  8. First thin AC-coupled silicon strip sensors on 8-inch wafers

    NASA Astrophysics Data System (ADS)

    Bergauer, T.; Dragicevic, M.; König, A.; Hacker, J.; Bartl, U.

    2016-09-01

    The Institute of High Energy Physics (HEPHY) in Vienna and the semiconductor manufacturer Infineon Technologies Austria AG developed a production process for planar AC-coupled silicon strip sensors manufactured on 200 μm thick 8-inch p-type wafers. In late 2015, the first wafers were delivered featuring the world's largest AC-coupled silicon strip sensors. Detailed electrical measurements were carried out at HEPHY, where single strip and global parameters were measured. Mechanical studies were conducted and the long-term behavior was investigated using a climate chamber. Furthermore, the electrical properties of various test structures were investigated to validate the quality of the manufacturing process.

  9. Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing

    NASA Astrophysics Data System (ADS)

    Zhu, Xianchang; Hu, Song; Zhao, Lixin

    2015-03-01

    To improve the focusing measurement precision of wafer in optical lithography instrument (OLI), a method based on Hartmann-Shack (HS) testing principle is introduced. Defocus of wafer is immediately detected by measuring the image change between plane and spherical wavefront. As defocus is measured by every sub-lens of microlens array (MLA), serials of defocus position are calculated at single shot of CCD sensor. Choose the average in this measurement the outstanding advantage of this technology is the high accuracy and efficiency. With an experiment to validate the feasibility, the accuracy of focusing measurement is indicated as 20 nm.

  10. First On-Wafer Power Characterization of MMIC Amplifiers at Sub-Millimeter Wave Frequencies

    NASA Technical Reports Server (NTRS)

    Fung, A. K.; Gaier, T.; Samoska, L.; Deal, W. R.; Radisic, V.; Mei, X. B.; Yoshida, W.; Liu, P. S.; Uyeda, J.; Barsky, M.; Lai, R.

    2008-01-01

    Recent developments in semiconductor technology have enabled advanced submillimeter wave (300 GHz) transistors and circuits. These new high speed components have required new test methods to be developed for characterizing performance, and to provide data for device modeling to improve designs. Current efforts in progressing high frequency testing have resulted in on-wafer-parameter measurements up to approximately 340 GHz and swept frequency vector network analyzer waveguide measurements to 508 GHz. On-wafer noise figure measurements in the 270-340 GHz band have been demonstrated. In this letter we report on on-wafer power measurements at 330 GHz of a three stage amplifier that resulted in a maximum measured output power of 1.78mW and maximum gain of 7.1 dB. The method utilized demonstrates the extension of traditional power measurement techniques to submillimeter wave frequencies, and is suitable for automated testing without packaging for production screening of submillimeter wave circuits.

  11. Integratible Process for Fabrication of Fluidic Microduct Networks on a Single Wafer

    SciTech Connect

    Matzke, C.M.; Ashby, C.I.; Bridges, M.M.; Griego, L.; Wong, C.C.

    1999-09-07

    We present a microelectronics fabrication compatible process that comprises photolithography and a key room temperature SiON thin film plasma deposition to define and seal a fluidic microduct network. Our single wafer process is independent of thermo-mechanical material properties, particulate cleaning, global flatness, assembly alignment, and glue medium application, which are crucial for wafer fusion bonding or sealing techniques using a glue medium. From our preliminary experiments, we have identified a processing window to fabricate channels on silicon, glass and quartz substrates. Channels with a radius of curvature between 8 and 50 {micro}m, are uniform along channel lengths of several inches and repeatable across the wafer surfaces. To further develop this technology, we have begun characterizing the SiON film properties such as elastic modulus using nanoindentation, and chemical bonding compatibility with other microelectronic materials.

  12. The design, fabrication, and test of a new VLSI hybrid analog-digital neural processing element

    NASA Technical Reports Server (NTRS)

    Deyong, Mark R.; Findley, Randall L.; Fields, Chris

    1992-01-01

    A hybrid analog-digital neural processing element with the time-dependent behavior of biological neurons has been developed. The hybrid processing element is designed for VLSI implementation and offers the best attributes of both analog and digital computation. Custom VLSI layout reduces the layout area of the processing element, which in turn increases the expected network density. The hybrid processing element operates at the nanosecond time scale, which enables it to produce real-time solutions to complex spatiotemporal problems found in high-speed signal processing applications. VLSI prototype chips have been designed, fabricated, and tested with encouraging results. Systems utilizing the time-dependent behavior of the hybrid processing element have been simulated and are currently in the fabrication process. Future applications are also discussed.

  13. Wafer-scale fabrication of nanoapertures using corner lithography

    NASA Astrophysics Data System (ADS)

    Burouni, Narges; Berenschot, Erwin; Elwenspoek, Miko; Sarajlic, Edin; Leussink, Pele; Jansen, Henri; Tas, Niels

    2013-07-01

    Several submicron probe technologies require the use of apertures to serve as electrical, optical or fluidic probes; for example, writing precisely using an atomic force microscope or near-field sensing of light reflecting from a biological surface. Controlling the size of such apertures below 100 nm is a challenge in fabrication. One way to accomplish this scale is to use high resolution tools such as deep UV or e-beam. However, these tools are wafer-scale and expensive, or only provide series fabrication. For this reason, in this study a versatile method adapted from conventional micromachining is investigated to fabricate protruding apertures on wafer-scale. This approach is called corner lithography and offers control of the size of the aperture with diameter less than 50 nm using a low-budget lithography tool. For example, by tuning the process parameters, an estimated mean size of 44.5 nm and an estimated standard deviation of 2.3 nm are found. The technique is demonstrated—based on a theoretical foundation including a statistical analysis—with the nanofabrication of apertures at the apexes of micromachined pyramids. Besides apertures, the technique enables the construction of wires, slits and dots into versatile three-dimensional structures.

  14. Innovative optical alignment technique for CMP wafers

    NASA Astrophysics Data System (ADS)

    Sugaya, Ayako; Kanaya, Yuho; Nakajima, Shinichi; Nagayama, Tadashi; Shiraishi, Naomasa

    2002-07-01

    Detecting position of the wafers such as after CMP process is critical theme of current and forthcoming IC manufacturing. The alignment system must be with high accuracy for any process. To satisfy such requirements, we have studied and analyzed factors that have made alignment difficult. From the result of the studies, we have developed new optical alignment techniques which improve the accuracy of FIA (alignment sensor of Nikon's NSR series) and examined them. The approaches are optimizing the focus position, developing an advanced algorithm for position detection, and selecting a suitable mark design. For experiment, we have developed the special wafers that make it possible to evaluate the influence of CMP processes. The experimental results show that the overlay errors decrease dramatically with the new alignment techniques. FIA with these new techniques will be much accurate and suitable alignment sensor for CMP and other processes of future generation ULSI production.

  15. Optical cavity furnace for semiconductor wafer processing

    DOEpatents

    Sopori, Bhushan L.

    2014-08-05

    An optical cavity furnace 10 having multiple optical energy sources 12 associated with an optical cavity 18 of the furnace. The multiple optical energy sources 12 may be lamps or other devices suitable for producing an appropriate level of optical energy. The optical cavity furnace 10 may also include one or more reflectors 14 and one or more walls 16 associated with the optical energy sources 12 such that the reflectors 14 and walls 16 define the optical cavity 18. The walls 16 may have any desired configuration or shape to enhance operation of the furnace as an optical cavity 18. The optical energy sources 12 may be positioned at any location with respect to the reflectors 14 and walls defining the optical cavity. The optical cavity furnace 10 may further include a semiconductor wafer transport system 22 for transporting one or more semiconductor wafers 20 through the optical cavity.

  16. Devices using resin wafers and applications thereof

    DOEpatents

    Lin, YuPo J.; Henry, Michael P.; Snyder, Seth W.; St. Martin, Edward; Arora, Michelle; de la Garza, Linda

    2009-03-24

    Devices incorporating a thin wafer of electrically and ionically conductive porous material made by the method of introducing a mixture of a thermoplastic binder and one or more of anion exchange moieties or cation exchange moieties or mixtures thereof and/or one or more of a protein capture resin and an electrically conductive material into a mold. The mixture is subjected to temperatures in the range of from about 60.degree. C. to about 170.degree. C. at pressures in the range of from about 0 to about 500 psig for a time in the range of from about 1 to about 240 minutes to form thin wafers. Devices include electrodeionization and separative bioreactors in the production of organic and amino acids, alcohols or esters for regenerating cofactors in enzymes and microbial cells.

  17. TOPICAL REVIEW: Wafer level packaging of MEMS

    NASA Astrophysics Data System (ADS)

    Esashi, Masayoshi

    2008-07-01

    Wafer level packaging plays many important roles for MEMS (micro electro mechanical systems), including cost, yield and reliability. MEMS structures on silicon chips are encapsulated between bonded wafers or by surface micromachining, and electrical interconnections are made from the cavity. Bonding at the interface, such as glass-Si anodic bonding and metal-to-metal bonding, requires electrical interconnection through the lid vias in many cases. On the other hand, lateral electrical interconnections on the surface of the chip are used for bonding with intermediate melting materials, such as low melting point glass and solder. The cavity formed by surface micromachining is made using sacrificial etching, and the openings needed for the sacrificial etching are plugged using deposition sealing methods. Vacuum packaging methods and the structures for electrical feedthrough for the interconnection are discussed in this review.

  18. A procedural method for the efficient implementation of full-custom VLSI designs

    NASA Technical Reports Server (NTRS)

    Belk, P.; Hickey, N.

    1987-01-01

    An imbedded language system for the layout of very large scale integration (VLSI) circuits is examined. It is shown that through the judicious use of this system, a large variety of circuits can be designed with circuit density and performance comparable to traditional full-custom design methods, but with design costs more comparable to semi-custom design methods. The high performance of this methodology is attributable to the flexibility of procedural descriptions of VLSI layouts and to a number of automatic and semi-automatic tools within the system.

  19. On the VLSI design of a pipeline Reed-Solomon decoder using systolic arrays

    NASA Astrophysics Data System (ADS)

    Shao, Howard M.; Reed, Irving S.

    1988-10-01

    A new very large scale integration (VLSI) design of a pipeline Reed-Solomon decoder is presented. The transform decoding technique used in a previous article is replaced by a time domain algorithm through a detailed comparison of their VLSI implementations. A new architecture that implements the time domain algorithm permits efficient pipeline processing with reduced circuitry. Erasure correction capability is also incorporated with little additional complexity. By using multiplexing technique, a new implementation of Euclid's algorithm maintains the throughput rate with less circuitry. Such improvements result in both enhanced capability and significant reduction in silicon area.

  20. On the VLSI design of a pipeline Reed-Solomon decoder using systolic arrays

    NASA Astrophysics Data System (ADS)

    Shao, H. M.; Deutsch, L. J.; Reed, I. S.

    1987-11-01

    A new very large scale integration (VLSI) design of a pipeline Reed-Solomon decoder is presented. The transform decoding technique used in a previous article is replaced by a time domain algorithm through a detailed comparison of their VLSI implementations. A new architecture that implements the time domain algorithm permits efficient pipeline processing with reduced circuitry. Erasure correction capability is also incorporated with little additional complexity. By using a multiplexing technique, a new implementation of Euclid's algorithm maintains the throughput rate with less circuitry. Such improvements result in both enhanced capability and significant reduction in silicon area.

  1. On the VLSI design of a pipeline Reed-Solomon decoder using systolic arrays

    NASA Technical Reports Server (NTRS)

    Shao, H. M.; Deutsch, L. J.; Reed, I. S.

    1987-01-01

    A new very large scale integration (VLSI) design of a pipeline Reed-Solomon decoder is presented. The transform decoding technique used in a previous article is replaced by a time domain algorithm through a detailed comparison of their VLSI implementations. A new architecture that implements the time domain algorithm permits efficient pipeline processing with reduced circuitry. Erasure correction capability is also incorporated with little additional complexity. By using a multiplexing technique, a new implementation of Euclid's algorithm maintains the throughput rate with less circuitry. Such improvements result in both enhanced capability and significant reduction in silicon area.

  2. On the VLSI design of a pipeline Reed-Solomon decoder using systolic arrays

    NASA Technical Reports Server (NTRS)

    Shao, Howard M.; Reed, Irving S.

    1988-01-01

    A new very large scale integration (VLSI) design of a pipeline Reed-Solomon decoder is presented. The transform decoding technique used in a previous article is replaced by a time domain algorithm through a detailed comparison of their VLSI implementations. A new architecture that implements the time domain algorithm permits efficient pipeline processing with reduced circuitry. Erasure correction capability is also incorporated with little additional complexity. By using multiplexing technique, a new implementation of Euclid's algorithm maintains the throughput rate with less circuitry. Such improvements result in both enhanced capability and significant reduction in silicon area.

  3. Wafer dicing utilizing unique beam shapes

    NASA Astrophysics Data System (ADS)

    Lizotte, Todd; Ohar, Orest

    2007-09-01

    Laser dicing of wafers is of keen interest to the semiconductor and LED industry. Devices such as ASICs, Ultra-thin Wafer Scale Packages and LEDS are unique in that they typically are formed from various materials in a multilayered structure. Many of these layers include active device materials, passivation coatings, conductors and dielectric films all deposited on top of a bulk wafer substrate and all potentially having differing ablation thresholds. These composite multi-layered structures require high finesse laser processes to ensure yields, cut quality and low process cost. Such processes have become very complex over the years as new devices have become miniaturized, requiring smaller kerf sizes. Of critical concern is the need to minimize substrate micro-cracking or lift off of upper layers along the dicing streets which directly corresponds to bulk device strength and device operational integrity over its projected lifetime. Laser processes involving the sequential use of single or multiple diode pumped solid state (DPSS) lasers, such as UV DPSS (355nn, 266nm, 532 nm), VIS DPSS (~532 nm) and IR DPSS (1064nm, 1070nm) as well as (UV, VIS, NIR, FIR and Eye Safe Wavelengths) DPFL (Diode Pumped Fiber Lasers) lasers to penetrate various and differing material layers and substrates including Silicon Carbide (SiC), Silicon, GaAs and Sapphire. Development of beam shaping optics with the purpose of permitting two or more differing energy densities within a single focused or imaged beam spot would provide opportunities for pre-processing or pre-scribing of thinner cover layers, while following through with a higher energy density segment to cut through the bulk base substrates. This paper will describe the development of beam shaping optical elements with unique beam shapes that could benefit dicing and patterning of delicate thin film coatings. Various designs will be described, with processing examples using LED wafer materials.

  4. Precipitating Chromium Impurities in Silicon Wafers

    NASA Technical Reports Server (NTRS)

    Salama, A. M.

    1982-01-01

    Two new treatments for silicon wafers improve solar-cell conversion efficiency by precipitating electrically-active chromium impurities. One method is simple heat treatment. Other involves laser-induced damage followed by similar heat treatment. Chromium is one impurity of concern in metallurgical-grade silicon for solar cells. In new treatment, chromium active centers are made electrically inactive by precipitating chromium from solid solution, enabling use of lower grade, lower cost silicon in cell manufacture.

  5. Mask-to-wafer alignment system

    DOEpatents

    Sweatt, William C.; Tichenor, Daniel A.; Haney, Steven J.

    2003-11-04

    A modified beam splitter that has a hole pattern that is symmetric in one axis and anti-symmetric in the other can be employed in a mask-to-wafer alignment device. The device is particularly suited for rough alignment using visible light. The modified beam splitter transmits and reflects light from a source of electromagnetic radiation and it includes a substrate that has a first surface facing the source of electromagnetic radiation and second surface that is reflective of said electromagnetic radiation. The substrate defines a hole pattern about a central line of the substrate. In operation, an input beam from a camera is directed toward the modified beam splitter and the light from the camera that passes through the holes illuminates the reticle on the wafer. The light beam from the camera also projects an image of a corresponding reticle pattern that is formed on the mask surface of the that is positioned downstream from the camera. Alignment can be accomplished by detecting the radiation that is reflected from the second surface of the modified beam splitter since the reflected radiation contains both the image of the pattern from the mask and a corresponding pattern on the wafer.

  6. A fast lightstripe rangefinding system with smart VLSI sensor

    NASA Technical Reports Server (NTRS)

    Gruss, Andrew; Carley, L. Richard; Kanade, Takeo

    1989-01-01

    The focus of the research is to build a compact, high performance lightstripe rangefinder using a Very Large Scale Integration (VLSI) smart photosensor array. Rangefinding, the measurement of the three-dimensional profile of an object or scene, is a critical component for many robotic applications, and therefore many techniques were developed. Of these, lightstripe rangefinding is one of the most widely used and reliable techniques available. Though practical, the speed of sampling range data by the conventional light stripe technique is severely limited. A conventional light stripe rangefinder operates in a step-and-repeat manner. A stripe source is projected on an object, a video image is acquired, range data is extracted from the image, the stripe is stepped, and the process repeats. Range acquisition is limited by the time needed to grab the video images, increasing linearly with the desired horizontal resolution. During the acquisition of a range image, the objects in the scene being scanned must be stationary. Thus, the long scene sampling time of step-and-repeat rangefinders limits their application. The fast range sensor proposed is based on the modification of this basic lightstripe ranging technique in a manner described by Sato and Kida. This technique does not require a sampling of images at various stripe positions to build a range map. Rather, an entire range image is acquired in parallel while the stripe source is swept continuously across the scene. Total time to acquire the range image data is independent of the range map resolution. The target rangefinding system will acquire 1,000 100 x 100 point range images per second with 0.5 percent range accuracy. It will be compact and rugged enough to be mounted on the end effector of a robot arm to aid in object manipulation and assembly tasks.

  7. Wafer weak point detection based on aerial images or WLCD

    NASA Astrophysics Data System (ADS)

    Ning, Guoxiang; Philipp, Peter; Litt, Lloyd C.; Ackmann, Paul; Crell, Christian; Chen, Norman

    2015-10-01

    Aerial image measurement is a key technique for model based optical proximity correction (OPC) verification. Actual aerial images obtained by AIMS (aerial image measurement system) or WLCD (wafer level critical dimension) can detect printed wafer weak point structures in advance of wafer exposure and defect inspection. Normally, the potential wafer weak points are determined based on optical rule check (ORC) simulation in advance. However, the correlation to real wafer weak points is often not perfect due to the contribution of mask three dimension (M3D) effects, actual mask errors, and scanner lens effects. If the design weak points can accurately be detected in advance, it will reduce the wafer fab cost and improve cycle time. WLCD or AIMS tools are able to measure the aerial images CD and bossung curve through focus window. However, it is difficult to detect the wafer weak point in advance without defining selection criteria. In this study, wafer weak points sensitive to mask mean-to-nominal values are characterized for a process with very high MEEF (normally more than 4). Aerial image CD uses fixed threshold to detect the wafer weak points. By using WLCD through threshold and focus window, the efficiency of wafer weak point detection is also demonstrated. A novel method using contrast range evaluation is shown in the paper. Use of the slope of aerial images for more accurate detection of the wafer weak points using WLCD is also discussed. The contrast range can also be used to detect the wafer weak points in advance. Further, since the mean to nominal of the reticle contributes to the effective contrast range in a high MEEF area this work shows that control of the mask error is critical for high MEEF layers such as poly, active and metal layers. Wafer process based weak points that cannot be detected by wafer lithography CD or WLCD will be discussed.

  8. Wafer-level reliability characterization for wafer-level packaged microbolometer with ultra-small array size

    NASA Astrophysics Data System (ADS)

    Kim, Hee Yeoun; Yang, Chungmo; Park, Jae Hong; Jung, Ho; Kim, Taehyun; Kim, Kyung Tae; Lim, Sung Kyu; Lee, Sang Woo; Mitchell, Jay; Hwang, Wook Joong; Lee, Kwyro

    2013-06-01

    For the development of small and low cost microbolometer, wafer level reliability characterization techniques of vacuum packaged wafer are introduced. Amorphous silicon based microbolometer-type vacuum sensors fabricated in 8 inch wafer are bonded with cap wafer by Au-Sn eutectic solder. Membrane deflection and integrated vacuum sensor techniques are independently used to characterize the hermeticity in a wafer-level. For the packaged wafer with membrane thickness below 100um, it is possible to determine the hermeticity as screening test by optical detection technique. Integrated vacuum sensor having the same structure as bolometer pixel shows the vacuum level below 100mTorr. All steps from packaging process to fine hermeticity test are implemented in wafer level to prove the high volume and low cost production.

  9. High density circuit technology, part 3

    NASA Technical Reports Server (NTRS)

    Wade, T. E.

    1982-01-01

    Dry processing - both etching and deposition - and present/future trends in semiconductor technology are discussed. In addition to a description of the basic apparatus, terminology, advantages, glow discharge phenomena, gas-surface chemistries, and key operational parameters for both dry etching and plasma deposition processes, a comprehensive survey of dry processing equipment (via vendor listing) is also included. The following topics are also discussed: fine-line photolithography, low-temperature processing, packaging for dense VLSI die, the role of integrated optics, and VLSI and technology innovations.

  10. Improving wafer level CD uniformity for logic applications utilizing mask level metrology and process

    NASA Astrophysics Data System (ADS)

    Cohen, Avi; Trautzsch, Thomas; Buttgereit, Ute; Graitzer, Erez; Hanuka, Ori

    2013-09-01

    Critical Dimension Uniformity (CDU) is one of the key parameters necessary to assure good performance and reliable functionality of any integrated circuit (IC). The extension of 193nm based lithography usage combined with design rule shrinkage makes process control, in particular the wafer level CDU control, an extremely important and challenging task in IC manufacturing. In this study the WLCD-CDC closed loop solution offered by Carl Zeiss SMS was examined. This solution aims to improve the wafer level intra-field CDU without the need to run wafer prints and extensive wafer CD metrology. It combines two stand-alone tools: The WLCD tool which measures CD based on aerial imaging technology while applying the exact scanner-used illumination conditions to the photomask and the CDC tool which utilizes an ultra-short femto-second laser to write intra-volume shading elements (Shade-In Elements™) inside the photomask bulk material. The CDC process changes the dose going through the photomask down to the wafer, hence the wafer level intra-field CDU improves. The objective of this study was to evaluate how CDC process is affecting the CD for different type of features and pattern density which are typical for logic and system on chip (SOC) devices. The main findings show that the linearity and proximity behavior is maintained by the CDC process and CDU and CDC Ratio (CDCR) show a linear behavior for the different feature types. Finally, it was demonstrated that the CDU errors of the targeted (critical) feature have been effectively eliminated. In addition, the CDU of all other features have been significantly improved as well.

  11. Aerial image measurement technique for automated reticle defect disposition (ARDD) in wafer fabs

    NASA Astrophysics Data System (ADS)

    Zibold, Axel M.; Schmid, Rainer M.; Stegemann, B.; Scheruebl, Thomas; Harnisch, Wolfgang; Kobiyama, Yuji

    2004-08-01

    The Aerial Image Measurement System (AIMS)* for 193 nm lithography emulation has been brought into operation successfully worldwide. A second generation system comprising 193 nm AIMS capability, mini-environment and SMIF, the AIMS fab 193 plus is currently introduced into the market. By adjustment of numerical aperture (NA), illumination type and partial illumination coherence to match the conditions in 193 nm steppers or scanners, it can emulate the exposure tool for any type of reticles like binary, OPC and PSM down to the 65 nm node. The system allows a rapid prediction of wafer printability of defects or defect repairs, and critical features, like dense patterns or contacts on the masks without the need to perform expensive image qualification consisting of test wafer exposures followed by SEM measurements. Therefore, AIMS is a mask quality verification standard for high-end photo masks and established in mask shops worldwide. The progress on the AIMS technology described in this paper will highlight that besides mask shops there will be a very beneficial use of the AIMS in the wafer fab and we propose an Automated Reticle Defect Disposition (ARDD) process. With smaller nodes, where design rules are 65 nm or less, it is expected that smaller defects on reticles will occur in increasing numbers in the wafer fab. These smaller mask defects will matter more and more and become a serious yield limiting factor. With increasing mask prices and increasing number of defects and severability on reticles it will become cost beneficial to perform defect disposition on the reticles in wafer production. Currently ongoing studies demonstrate AIMS benefits for wafer fab applications. An outlook will be given for extension of 193 nm aerial imaging down to the 45 nm node based on emulation of immersion scanners.

  12. Laser cutting silicon-glass double layer wafer with laser induced thermal-crack propagation

    NASA Astrophysics Data System (ADS)

    Cai, Yecheng; Yang, Lijun; Zhang, Hongzhi; Wang, Yang

    2016-07-01

    This study was aimed at introducing the laser induced thermal-crack propagation (LITP) technology to solve the silicon-glass double layer wafer dicing problems in the packaging procedure of silicon-glass device packaged by WLCSP technology, investigating the feasibility of this idea, and studying the crack propagation process of LITP cutting double layer wafer. In this paper, the physical process of the 1064 nm laser beam interact with the double layer wafer during the cutting process was studied theoretically. A mathematical model consists the volumetric heating source and the surface heating source has been established. The temperature and stress distribution was simulated by using finite element method (FEM) analysis software ABAQUS. The extended finite element method (XFEM) was added to the simulation as the supplementary features to simulate the crack propagation process and the crack propagation profile. The silicon-glass double layer wafer cutting verification experiment under typical parameters was conducted by using the 1064 nm semiconductor laser. The crack propagation profile on the fracture surface was examined by optical microscope and explained from the stress distribution and XFEM status. It was concluded that the quality of the finished fracture surface has been greatly improved, and the experiment results were well supported by the numerical simulation results.

  13. Thinning of PLZT ceramic wafers for sensor integration

    NASA Astrophysics Data System (ADS)

    Jin, Na; Liu, Weiguo

    2010-08-01

    Characteristics of transparent PLZT ceramics can be tailored by controlling the component of them, and therefore showed excellent dielectric, piezoelectric, pyroelectric and ferroelectric properties. To integrate the ceramics with microelectronic circuit to realize integrated applications, the ceramic wafers have to be thinned down to micrometer scale in thickness. A7/65/35 PLZT ceramic wafer was selected in this study for the thinning process. Size of the wafer was 10×10mm with an initial thickness of 300μm. A novel membrane transfer process (MTP) was developed for the thinning and integration of the ceramic wafers. In the MTP process, the ceramic wafer was bonded to silicon wafer using a polymer bonding method. Mechanical grinding method was applied to reduce the thickness of the ceramic. To minimize the surface damage in the ceramic wafer caused by the mechanical grinding, magnetorheological finishing (MRF) method was utilized to polish the wafer. White light interference (WLI) apparatus was used to monitor the surface qualities of the grinded and ploished ceramic wafers. For the PLZT membrane obtained from the MTP process, the final thickness of the thinned and polished wafer was 10μm, the surface roughness was below 1nm in rms, and the flatness was better than λ/5.

  14. Nanotribology of nanooxide materials in ionic liquids on silicon wafers

    NASA Astrophysics Data System (ADS)

    Hamidunsani, Ahmad Termizi; Radiman, Shahidan; Hassan, Masjuki Haji; Rahman, Irman Abdul

    2015-09-01

    Nanotribological properties have a significant impact on daily life. Ionic liquids (ILs) are becoming new favourable lubricants currently in researches. Addition of nanooxide materials in lubricants provide improvements to new technology. In this study, we determine nanotribological properties of BMIM+BF4- IL addition of different amount of ZnO nanomaterial on single crystals silicon wafer (Si110). The viscosity changes of IL samples against temperature increase were determined by rheological method. Nanotribological properties were determined by changes in friction coefficient and wear rate on silicon substrate surfaces using a reciprocating friction and wear monitor in 1 hour duration time. Aluminium cylinders acted as pins used to rub Si (110) substrate sample surfaces. Thus, on range between 0 mg to 3.5 mg of ZnO nanooxide material dispersed in 10ml BMIM+BF4- showed a good friction coefficient, wear and surface roughness reduction.

  15. Characterization of semiconductor surface-emitting laser wafers

    SciTech Connect

    Gourley, P.L.; Vawter, G.A.; Brennan, T.M.; Hammons, B.E.

    1990-01-01

    The development of epitaxial semiconductor surface-emitting lasers has begun in recent years. These lasers are ultra-short (few {mu}m) Fabry-Perot resonators comprising epitaxial multilayer semiconductor mirrors and quantum well active regions. The resonators are single crystals grown along the lasing axis by molecular beam epitaxy (MBE) or chemical vapor deposition (CVD). They offer significant advances over conventional cleaved, edge-emitting lasers for creating lasers with single elements of 2 dimensional arrays, low beam divergence, engineered active regions, single longitudinal modes, and improved temperature characteristics. To realize the high potential of these new laser structures, techniques for characterizing the laser wafer after growth and between fabrication steps must be developed. In this paper we discuss several optical techniques that we have developed for this emerging surface-emitting laser technology.

  16. VLSI chip-set for data compression using the Rice algorithm

    NASA Technical Reports Server (NTRS)

    Venbrux, J.; Liu, N.

    1990-01-01

    A full custom VLSI implementation of a data compression encoder and decoder which implements the lossless Rice data compression algorithm is discussed in this paper. The encoder and decoder reside on single chips. The data rates are to be 5 and 10 Mega-samples-per-second for the decoder and encoder respectively.

  17. Design, fabrication, and integration of micro/nano-scale optical waveguide arrays and devices for optical printed circuit board (O-PCB) and VLSI micro/nano-photonic application

    NASA Astrophysics Data System (ADS)

    Lee, El-Hang; Lee, S. G.; O, B. H.; Kim, K. H.; Kang, J. K.; Kwon, Y. K.; Chin, I.-J.; Choi, Y. W.; Song, S. H.

    2005-09-01

    We present a review of our work on the micro/nano-scale design, fabrication and integration of optical waveguide arrays and devices for applications in a newly-conceived optical module system that we call "optical printed circuit board" (O-PCBs) and VLSI micro/nano-photonic integrated circuit. The O-PCBs consist of planar circuits and arrays of waveguides and devices of various dimensions and characteristics to perform the functions of transporting, switching, routing and distributing optical signals on flat modular boards. The VLSI micro/nano-photonic integrated circuits perform similar functions on a chip scale. O-PCBs consist of planar circuits and arrays of waveguides and devices of various dimensions and characteristics to perform the functions of transporting, switching, routing and distributing optical signals on flat modular boards. Fundamentally it contrasts with the electrical printed circuit board (E-PCB), which is designed to perform transporting, processing and distributing electrical signals. We have assembled O-PCBs using optical waveguide arrays and circuits made of polymer materials and have examined information handling performances when they are interconnected with the micro-laser arrays, detector arrays and optoelectronic devices. For VLSI nano-scale photonic inte-gration and applications, we designed power splitters and waveguide filters using photonic band-gap crystals and plasmonic waveguide structures. We discuss scientific issues and technological issues concerning the minia-turization, interconnection, and integration of micro/nano-photonic devices and circuits and discuss potential utilities of O-PCBs and VLSI micro/nano-photonics for applications in computers, telecommunication systems, transportation systems, and bio-sensing microsystems.

  18. High density circuit technology, part 1

    NASA Technical Reports Server (NTRS)

    Wade, T. E.

    1982-01-01

    The metal (or dielectric) lift-off processes used in the semiconductor industry to fabricate high density very large scale integration (VLSI) systems were reviewed. The lift-off process consists of depositing the light-sensitive material onto the wafer and patterning first in such a manner as to form a stencil for the interconnection material. Then the interconnection layer is deposited and unwanted areas are lifted off by removing the underlying stencil. Several of these lift-off techniques were examined experimentally. The use of an auxiliary layer of polyimide to form a lift-off stencil offers considerable promise.

  19. Electrooptic shutter devices utilizing PLZT ceramic wafers

    SciTech Connect

    Thornton, A.L.

    1981-01-01

    Optical transparency was achieved in lead zirconate-titanate ferroelectric ceramics by substituting moderate amounts of the element lanthanum (8 to 12%) for lead. These compositions exhibit the quadratic (Kerr) electrooptic effect. The excellent optical qualities of these materials (designated PLZT) has permitted the practical utilization of their electrooptic properties in a number of devices. All of these devices utilize the classic Kerr cell arrangement. A PLZT wafer with optical axis oriented at 45/sup 0/ with respect to the axes of polarization is sandwiched between crossed polarizers. Application of an electric field via an interdigital array of electrodes on opposing wafer surfaces forces the PLZT material into a tetragonal state with the resulting induced birefringence proportional to the square of the applied electric field. Hence, the electrooptic wafer provides a retardation of light so that a component is passed by the second crossed polarizer to achieve an ON or open state. Maximum transmission is achieved when the retardation is half-wave. Shutter devices developed by Sandia and those in continuing development are described with respect to operational characteristics and physical configuration. The devices range in size from very small apertures of 50 ..mu..m x 2 mm with center-to-center repeat dimensions of 125 ..mu..m - to very large - apertures of 15.2 cm in single pieces and mosaics with apertures of 15.2 cm x 20.3 cm. Major efforts have centered on shutter development for the protection of aircrew from eye-damaging weapon effects. Other devices are also described which: provide eye protection for welders, protect vidicon tubes, function as page composers for holographic memories serve as large aperture photographic shutters, provide stereoscopic three-dimensional TV displays, and serve as data links in a fiber-optic transmission path.

  20. Super-flat wafer chucks: from simulation and testing to a complete 300mm wafer chuck with low wafer deformation between pins

    NASA Astrophysics Data System (ADS)

    Müller, Renate; Afanasiev, Kanstantin; Ziemann, Marcel; Schmidt, Volker

    2014-04-01

    Berliner Glas is a privately owned, mid-sized manufacturer of precision opto-mechanics in Germany. One specialty of Berliner Glas is the design and production of high performance vacuum and electrostatic wafer chucks. Driven by the need of lithography and inspection for smaller overlay values, we pursue the production of an ideally flat wafer chuck. An ideally flat wafer chuck holds a wafer with a completely flat backside and without lateral distortion within the wafer surface. Key parameters in influencing the wafer chucks effective flatness are thermal performance and thermal management, roughness of the surface, choice of materials and the contact area between wafer and wafer chuck. In this presentation we would like to focus on the contact area. Usually this is decreased as much as possible to avoid sticking effects and the chance of trapped particles between the chuck surface and the backside of the wafer. This can be realized with a pin structure on the chuck surface. Making the pins smaller and moving pins further apart from each other makes the contact area ever smaller but also adds new challenges to achieve a flat and undistorted wafer on the chuck. We would like to address methods of designing and evaluating such a pin structure. This involves not only the capability to simulate the ideal pattern of pins on the chuck's surface, for which we will present 2D and 3D simulation results. As well, we would like to share first results of our functional models. Finally, measurement capability has to be ensured, which means improving and further development of Fizeau flatness test interferometers.

  1. Photoluminescence method of testing double heterostructure wafers

    SciTech Connect

    Besomi, P.R.; Wilt, D.P.

    1984-04-10

    Under photoluminescence (PL) excitation, the lateral spreading of photo-excited carriers can suppress the photoluminescence signal from double heterostructure (DH) wafers containing a p-n junction. In any DH with a p-n junction in the active layer, PL is suppressed if the power of the excitation source does not exceed a threshold value. This effect can be advantageously used for a nondestructive optical determination of the top cladding layer sheet conductance as well as p-n junction misplacement, important parameters for injection lasers and LEDs.

  2. Wafer-scale aluminum nano-plasmonics

    NASA Astrophysics Data System (ADS)

    George, Matthew C.; Nielson, Stew; Petrova, Rumyana; Frasier, James; Gardner, Eric

    2014-09-01

    The design, characterization, and optical modeling of aluminum nano-hole arrays are discussed for potential applications in surface plasmon resonance (SPR) sensing, surface-enhanced Raman scattering (SERS), and surface-enhanced fluorescence spectroscopy (SEFS). In addition, recently-commercialized work on narrow-band, cloaked wire grid polarizers composed of nano-stacked metal and dielectric layers patterned over 200 mm diameter wafers for projection display applications is reviewed. The stacked sub-wavelength nanowire grid results in a narrow-band reduction in reflectance by 1-2 orders of magnitude, which can be tuned throughout the visible spectrum for stray light control.

  3. CMOS VLSI Active-Pixel Sensor for Tracking

    NASA Technical Reports Server (NTRS)

    Pain, Bedabrata; Sun, Chao; Yang, Guang; Heynssens, Julie

    2004-01-01

    An architecture for a proposed active-pixel sensor (APS) and a design to implement the architecture in a complementary metal oxide semiconductor (CMOS) very-large-scale integrated (VLSI) circuit provide for some advanced features that are expected to be especially desirable for tracking pointlike features of stars. The architecture would also make this APS suitable for robotic- vision and general pointing and tracking applications. CMOS imagers in general are well suited for pointing and tracking because they can be configured for random access to selected pixels and to provide readout from windows of interest within their fields of view. However, until now, the architectures of CMOS imagers have not supported multiwindow operation or low-noise data collection. Moreover, smearing and motion artifacts in collected images have made prior CMOS imagers unsuitable for tracking applications. The proposed CMOS imager (see figure) would include an array of 1,024 by 1,024 pixels containing high-performance photodiode-based APS circuitry. The pixel pitch would be 9 m. The operations of the pixel circuits would be sequenced and otherwise controlled by an on-chip timing and control block, which would enable the collection of image data, during a single frame period, from either the full frame (that is, all 1,024 1,024 pixels) or from within as many as 8 different arbitrarily placed windows as large as 8 by 8 pixels each. A typical prior CMOS APS operates in a row-at-a-time ( grolling-shutter h) readout mode, which gives rise to exposure skew. In contrast, the proposed APS would operate in a sample-first/readlater mode, suppressing rolling-shutter effects. In this mode, the analog readout signals from the pixels corresponding to the windows of the interest (which windows, in the star-tracking application, would presumably contain guide stars) would be sampled rapidly by routing them through a programmable diagonal switch array to an on-chip parallel analog memory array. The

  4. Performance of a novel wafer scale CMOS active pixel sensor for bio-medical imaging.

    PubMed

    Esposito, M; Anaxagoras, T; Konstantinidis, A C; Zheng, Y; Speller, R D; Evans, P M; Allinson, N M; Wells, K

    2014-07-01

    Recently CMOS active pixels sensors (APSs) have become a valuable alternative to amorphous silicon and selenium flat panel imagers (FPIs) in bio-medical imaging applications. CMOS APSs can now be scaled up to the standard 20 cm diameter wafer size by means of a reticle stitching block process. However, despite wafer scale CMOS APS being monolithic, sources of non-uniformity of response and regional variations can persist representing a significant challenge for wafer scale sensor response. Non-uniformity of stitched sensors can arise from a number of factors related to the manufacturing process, including variation of amplification, variation between readout components, wafer defects and process variations across the wafer due to manufacturing processes. This paper reports on an investigation into the spatial non-uniformity and regional variations of a wafer scale stitched CMOS APS. For the first time a per-pixel analysis of the electro-optical performance of a wafer CMOS APS is presented, to address inhomogeneity issues arising from the stitching techniques used to manufacture wafer scale sensors. A complete model of the signal generation in the pixel array has been provided and proved capable of accounting for noise and gain variations across the pixel array. This novel analysis leads to readout noise and conversion gain being evaluated at pixel level, stitching block level and in regions of interest, resulting in a coefficient of variation ⩽1.9%. The uniformity of the image quality performance has been further investigated in a typical x-ray application, i.e. mammography, showing a uniformity in terms of CNR among the highest when compared with mammography detectors commonly used in clinical practice. Finally, in order to compare the detection capability of this novel APS with the technology currently used (i.e. FPIs), theoretical evaluation of the detection quantum efficiency (DQE) at zero-frequency has been performed, resulting in a higher DQE for this

  5. Performance of a novel wafer scale CMOS active pixel sensor for bio-medical imaging

    NASA Astrophysics Data System (ADS)

    Esposito, M.; Anaxagoras, T.; Konstantinidis, A. C.; Zheng, Y.; Speller, R. D.; Evans, P. M.; Allinson, N. M.; Wells, K.

    2014-07-01

    Recently CMOS active pixels sensors (APSs) have become a valuable alternative to amorphous silicon and selenium flat panel imagers (FPIs) in bio-medical imaging applications. CMOS APSs can now be scaled up to the standard 20 cm diameter wafer size by means of a reticle stitching block process. However, despite wafer scale CMOS APS being monolithic, sources of non-uniformity of response and regional variations can persist representing a significant challenge for wafer scale sensor response. Non-uniformity of stitched sensors can arise from a number of factors related to the manufacturing process, including variation of amplification, variation between readout components, wafer defects and process variations across the wafer due to manufacturing processes. This paper reports on an investigation into the spatial non-uniformity and regional variations of a wafer scale stitched CMOS APS. For the first time a per-pixel analysis of the electro-optical performance of a wafer CMOS APS is presented, to address inhomogeneity issues arising from the stitching techniques used to manufacture wafer scale sensors. A complete model of the signal generation in the pixel array has been provided and proved capable of accounting for noise and gain variations across the pixel array. This novel analysis leads to readout noise and conversion gain being evaluated at pixel level, stitching block level and in regions of interest, resulting in a coefficient of variation ⩽1.9%. The uniformity of the image quality performance has been further investigated in a typical x-ray application, i.e. mammography, showing a uniformity in terms of CNR among the highest when compared with mammography detectors commonly used in clinical practice. Finally, in order to compare the detection capability of this novel APS with the technology currently used (i.e. FPIs), theoretical evaluation of the detection quantum efficiency (DQE) at zero-frequency has been performed, resulting in a higher DQE for this

  6. Investigation of intrinsic gettering for germanium doped Czochralski silicon wafer

    NASA Astrophysics Data System (ADS)

    Chen, Jiahe; Yang, Deren; Ma, Xiangyang; Wang, Weiyan; Zeng, Yuheng; Que, Duanlin

    2007-06-01

    The intrinsic gettering (IG) effects in a germanium-doped Czochralski (GCz) silicon wafer have been investigated through a processing simulation of dynamic random access memory making and an evaluation on IG capability for copper contamination. It has been suggested that both the good quality defect-free denuded zones (DZs) and the high-density bulk microdefect (BMD) regions could be generated in GCz silicon wafer during device fabrication. Meanwhile, it was also indicated that the tiny oxygen precipitates were hardly presented in DZs of silicon wafer with the germanium doping. Furthermore, it was found in GCz silicon wafer that the BMDs were higher in density but smaller in size in contrast to that in conventional Cz silicon wafer. Promoted IG capability for metallic contamination was therefore induced in the germanium-doped Cz silicon wafer. A mechanism of the germanium doping on oxygen precipitation in Cz silicon was discussed, which was based on the hypothesis of germanium-related complexes.

  7. Wafer-Level Membrane-Transfer Process for Fabricating MEMS

    NASA Technical Reports Server (NTRS)

    Yang, Eui-Hyeok; Wiberg, Dean

    2003-01-01

    A process for transferring an entire wafer-level micromachined silicon structure for mating with and bonding to another such structure has been devised. This process is intended especially for use in wafer-level integration of microelectromechanical systems (MEMS) that have been fabricated on dissimilar substrates. Unlike in some older membrane-transfer processes, there is no use of wax or epoxy during transfer. In this process, the substrate of a wafer-level structure to be transferred serves as a carrier, and is etched away once the transfer has been completed. Another important feature of this process is that two electrodes constitutes an electrostatic actuator array. An SOI wafer and a silicon wafer (see Figure 1) are used as the carrier and electrode wafers, respectively. After oxidation, both wafers are patterned and etched to define a corrugation profile and electrode array, respectively. The polysilicon layer is deposited on the SOI wafer. The carrier wafer is bonded to the electrode wafer by using evaporated indium bumps. The piston pressure of 4 kPa is applied at 156 C in a vacuum chamber to provide hermetic sealing. The substrate of the SOI wafer is etched in a 25 weight percent TMAH bath at 80 C. The exposed buried oxide is then removed by using 49 percent HF droplets after an oxygen plasma ashing. The SOI top silicon layer is etched away by using an SF6 plasma to define the corrugation profile, followed by the HF droplet etching of the remaining oxide. The SF6 plasma with a shadow mask selectively etches the polysilicon membrane, if the transferred membrane structure needs to be patterned. Electrostatic actuators with various electrode gaps have been fabricated by this transfer technique. The gap between the transferred membrane and electrode substrate is very uniform ( 0.1 m across a wafer diameter of 100 mm, provided by optimizing the bonding control). Figure 2 depicts the finished product.

  8. In-situ wafer bowing measurements of GaN grown on Si (111) substrate by reflectivity mapping in metal organic chemical vapor deposition system

    NASA Astrophysics Data System (ADS)

    Yang, Yi-Bin; Liu, Ming-Gang; Chen, Wei-Jie; Han, Xiao-Biao; Chen, Jie; Lin, Xiu-Qi; Lin, Jia-Li; Luo, Hui; Liao, Qiang; Zang, Wen-Jie; Chen, Yin-Song; Qiu, Yun-Ling; Wu, Zhi-Sheng; Liu, Yang; Zhang, Bai-Jun

    2015-09-01

    In this work, the wafer bowing during growth can be in-situ measured by a reflectivity mapping method in the 3×2″ Thomas Swan close coupled showerhead metal organic chemical vapor deposition (MOCVD) system. The reflectivity mapping method is usually used to measure the film thickness and growth rate. The wafer bowing caused by stresses (tensile and compressive) during the epitaxial growth leads to a temperature variation at different positions on the wafer, and the lower growth temperature leads to a faster growth rate and vice versa. Therefore, the wafer bowing can be measured by analyzing the discrepancy of growth rates at different positions on the wafer. Furthermore, the wafer bowings were confirmed by the ex-situ wafer bowing measurement. High-resistivity and low-resistivity Si substrates were used for epitaxial growth. In comparison with low-resistivity Si substrate, GaN grown on high-resistivity substrate shows a larger wafer bowing caused by the highly compressive stress introduced by compositionally graded AlGaN buffer layer. This transition of wafer bowing can be clearly in-situ measured by using the reflectivity mapping method. Project supported by the National Natural Science Foundation of China (Grant Nos. 61274039 and 51177175), the National Basic Research Program of China (Grant No. 2011CB301903), the Ph.D. Programs Foundation of Ministry of Education of China (Grant No. 20110171110021), the International Science and Technology Collaboration Program of China (Grant No. 2012DFG52260), the International Science and Technology Collaboration Program of Guangdong Province, China (Grant No. 2013B051000041), the Science and Technology Plan of Guangdong Province, China (Grant No. 2013B010401013), the National High Technology Research and Development Program of China (Grant No. 2014AA032606), and the Opened Fund of the State Key Laboratory on Integrated Optoelectronics, China (Grant No. IOSKL2014KF17).

  9. Study of effects of sidewall angle on process window using 193nm CPL masks in a 300mm wafer manufacturing environment

    NASA Astrophysics Data System (ADS)

    Cheng, Yung Feng; Chou, Yueh Lin; Lin, C. L.; Huang, Peter

    2005-11-01

    As semiconductor process technology moves down below 90nm and 65nm, more and more wafer fabs are starting to apply 193nm CPL (Chromeless Phase Lithography) technology as the main lithography strategy for their most critical layers. However the 3D pattern profile is another critical factor, which affects image intensity and final process window. Since 193nm CPL is a relatively new technology in the semiconductor industry, it is important for us to understand the key mask specifications of 193nm CPL and their impact on wafer-level imaging. In this paper, we will study the effects of sidewall angle on process window and wafer CD using 193nm CPL masks in a 300mm wafer manufacturing environment. We begin our experiment by making several special 193nm CPL masks. These masks have been specially designed with different sidewall angles (SWA) with phase of 180 degrees. The sidewall angle spread represents approximately 10 degrees. We use specially designed test patterns that are compatible at the 65nm technology node. In our experiment, we first study the correlation between AFM (atomic force microscope)-determined profile angle and lithographic process behavior. In addition, simulation was also used to predict the impact of 3D profile on process performance. All lithographic experiments were performed on 300mm wafers using a high NA ASML 193nm scanner and high contrast resist. In this study, we have focused on the impact of sidewall angle on wafer process performance by comparing the wafer CD and pattern profile through focus. In order to establish more effective specifications of angle control in 193nm CPL between mask shop and wafer fabs, all AFM, wafer CD, and simulation results will be compared and correlated.

  10. Dominant factors of the laser gettering of silicon wafers

    SciTech Connect

    Bokhan, Yu. I. E-mail: yuibokhan@gmail.com; Kamenkov, V. S.; Tolochko, N. K.

    2015-02-15

    The laser gettering of silicon wafers is experimentally investigated. The typical gettering parameters are considered. The surfaces of laser-treated silicon wafers are investigated by microscopy. When studying the effect of laser radiation on silicon wafers during gettering, a group of factors determining the conditions of interaction between the laser beam and silicon-wafer surface and affecting the final result of treatment are selected. The main factors determining the gettering efficiency are revealed. Limitations on the desired value of the getter-layer capacity on surfaces with insufficiently high cleanness (for example, ground or matte) are established.

  11. Particulate contamination removal from wafers using plasmas and mechanical agitation

    DOEpatents

    Selwyn, G.S.

    1998-12-15

    Particulate contamination removal from wafers is disclosed using plasmas and mechanical agitation. The present invention includes the use of plasmas with mechanical agitation for removing particulate matter from the surface of a wafer. The apparatus hereof comprises a mechanical activator, at least one conducting contact pin for transferring the vibration from the activator to the wafer, clamp fingers that maintain the wafer`s position, and means for generating a plasma in the vicinity of the surface of the wafer, all parts of the cleaning apparatus except the mechanical activator and part of the contact pin being contained inside the processing chamber. By exposing a wafer to a plasma and providing motion thereto in a direction perpendicular to its surface, the bonding between the particulate matter and the surface may be overcome. Once free of the wafer surface, the particulates become charged by electrons from the plasma and are drawn into the plasma by attractive forces which keep them from redepositing. The introduction of a flowing gas through the plasma sweeps the particulates away from the wafer and out of the plasma. The entire surface is cleaned during one cleaning step. The use of an rf plasma to accomplish the particulate removal was found to remove more than 90% of the particulates. 4 figs.

  12. Micro-miniature gas chromatograph column disposed in silicon wafers

    DOEpatents

    Yu, Conrad M.

    2000-01-01

    A micro-miniature gas chromatograph column is fabricated by forming matching halves of a circular cross-section spiral microcapillary in two silicon wafers and then bonding the two wafers together using visual or physical alignment methods. Heating wires are deposited on the outside surfaces of each wafer in a spiral or serpentine pattern large enough in area to cover the whole microcapillary area inside the joined wafers. The visual alignment method includes etching through an alignment window in one wafer and a precision-matching alignment target in the other wafer. The two wafers are then bonded together using the window and target. The physical alignment methods include etching through vertical alignment holes in both wafers and then using pins or posts through corresponding vertical alignment holes to force precision alignment during bonding. The pins or posts may be withdrawn after curing of the bond. Once the wafers are bonded together, a solid phase of very pure silicone is injected in a solution of very pure chloroform into one end of the microcapillary. The chloroform lowers the viscosity of the silicone enough that a high pressure hypodermic needle with a thumbscrew plunger can force the solution into the whole length of the spiral microcapillary. The chloroform is then evaporated out slowly to leave the silicone behind in a deposit.

  13. The impact of wafering on organic and inorganic surface contaminations

    NASA Astrophysics Data System (ADS)

    Meyer, S.; Wahl, S.; Timmel, S.; Köpge, R.; Jang, B.-Y.

    2016-08-01

    Beside the silicon feedstock material, the crystallization process and the cell processing itself, the wafer sawing process can strongly determine the final solar cell quality. Especially surface contamination is introduced in this process step because impurities from sawing meet with a virgin silicon surface which is highly reactive until the oxide layer is formed. In this paper we quantitatively analysed both, the organic and inorganic contamination on wafer surfaces and show that changes of process parameters during wafering may cause dramatic changes in surface purity. We present powerful techniques for the monitoring of wafer surface quality which is essential for the production of high efficiency and high quality solar cells.

  14. Magnetometory of AlGaN/GaN heterostructure wafers

    NASA Astrophysics Data System (ADS)

    Tsubaki, K.; Maeda, N.; Saitoh, T.; Kobayashi, N.

    2005-06-01

    AlGaN/GaN heterostructure wafers are becoming a key technology for next generation cellar-phone telecommunication system because of their potential for high-performance microwave applications. Therefore, the electronic properties of a 2DEG in AlGaN/GaN heterostructures have recently been discussed. In this paper, we performed the extraordinary Hall effect measurement and the SQUID magnetometory of AlGaN/GaN heterostructure wafer at low temperature. The AlGaN/GaN heterostructures were grown by low-pressure metal-organic chemical vapour phase epitaxy on (0001) SiC substrate using AlN buffers. The electron mobility and electron concentration at 4.2 K are 9,540cm2/V s and 6.6 × 1012cm-2, respectively. In the extraordinary Hall effect measurement of AlGaN/GaN heterostructures, the hysteresis of Hall resistance appeared below 4.5 K and disappeared above 4.5 K. On the other hand, the hysteresis of magnetometric data obtained by SQUID magnetometory appears near zero magnetic field when the temperature is lower than 4.5 K. At the temperature larger than 4.5 K, the hysteresis of magnetometric data disappears. And the slopes of magnetometric data with respect to magnetic field become lower as obeying Currie-Weiss law and the Curie temperature TC is 4.5 K. Agreement of TC measured by the extraordinary Hall effect and the SQUID magnetometory implies the ferromagnetism at the AlGaN/GaN heterojunction. However, the conformation of the ferromagnetism of AlGaN/GaN heterostructure is still difficult and the detailed physical mechanism is still unclear.

  15. TiW particle control for VLSI manufacturing

    NASA Astrophysics Data System (ADS)

    Gn, Fang H.; Yeap, Chuin B.; Li, He M.; Liu, E. Z.; Chew, Heng L.

    1995-09-01

    TiW has been used extensively as the barrier metal in submicron metallization. However, TiW has also drawn much attention as the source of defect generation contributing to functional yield loss. Usually, the defects are in the form of flakes which can be detected by either using light scattering metrology tools or naked eye in severe situations. In this paper various manufacturing techniques will be presented which reduce defect during the TiW sputtering process. Both arc-sprayed process kit (chamber shield and clamping ring) and TiW paste at fixed intervals have been proven to be effective in reducing TiW particles. Implementation of these two techniques is relatively simple and has been used very successfully in Chartered's 6 inch wafer fab. Another study shows that by reducing the process kit thermal cycling through continuously having the bake-out lamp turned on is effective for particle control. Effect of the grain size of TiW sputter target and the application of Particle Gettering (PG) foil will also be discussed in detail as other means of particle reduction.

  16. Eutectic bonds on wafer scale by thin film multilayers

    NASA Astrophysics Data System (ADS)

    Christensen, Carsten; Bouwstra, Siebe

    1996-09-01

    The use of gold based thin film multilayer systems for forming eutectic bonds on wafer scale is investigated and preliminary results will be presented. On polished 4 inch wafers different multilayer systems are developed using thin film techniques and bonded afterwards under reactive atmospheres and different bonding temperatures and forces. Pull tests are performed to extract the bonding strengths.

  17. Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding

    PubMed Central

    Thomson, Stephen R. D.; Perron, Justin K.; Kimball, Mark O.; Mehta, Sarabjit; Gasparini, Francis M.

    2014-01-01

    Measurements of the heat capacity and superfluid fraction of confined 4He have been performed near the lambda transition using lithographically patterned and bonded silicon wafers. Unlike confinements in porous materials often used for these types of experiments3, bonded wafers provide predesigned uniform spaces for confinement. The geometry of each cell is well known, which removes a large source of ambiguity in the interpretation of data. Exceptionally flat, 5 cm diameter, 375 µm thick Si wafers with about 1 µm variation over the entire wafer can be obtained commercially (from Semiconductor Processing Company, for example). Thermal oxide is grown on the wafers to define the confinement dimension in the z-direction. A pattern is then etched in the oxide using lithographic techniques so as to create a desired enclosure upon bonding. A hole is drilled in one of the wafers (the top) to allow for the introduction of the liquid to be measured. The wafers are cleaned2 in RCA solutions and then put in a microclean chamber where they are rinsed with deionized water4. The wafers are bonded at RT and then annealed at ~1,100 °C. This forms a strong and permanent bond. This process can be used to make uniform enclosures for measuring thermal and hydrodynamic properties of confined liquids from the nanometer to the micrometer scale. PMID:24457563

  18. Analysis of wafer heating in 14nm DUV layers

    NASA Astrophysics Data System (ADS)

    Subramany, Lokesh; Chung, Woong Jae; Samudrala, Pavan; Gao, Haiyong; Aung, Nyan; Gomez, Juan Manuel; Minghetti, Blandine; Lee, Shawn

    2016-03-01

    To further shrink the contact and trench dimensions, Negative Tone Development (NTD) has become the de facto process at these layers. The NTD process uses a positive tone resist and an organic solvent-based negative tone developer which leads to improved image contrast, larger process window and smaller Mask Error Enhancement Factor (MEEF)[1]. The NTD masks have high transmission values leading to lens heating and as observed here wafer heating as well. Both lens and wafer heating will contribute to overlay error, however the effects of lens heating can be mitigated by applying lens heating corrections while no such corrections exist for wafer heating yet. Although the magnitude of overlay error due to wafer heating is low relative to lens heating; ever tightening overlay requirements imply that the distortions due to wafer heating will quickly become a significant part of the overlay budget. In this work the effects, analysis and observations of wafer heating on contact and metal layers of the 14nm node are presented. On product wafers it manifests as a difference in the scan up and scan down signatures between layers. An experiment to further understand wafer heating is performed with a test reticle that is used to monitor scanner performance.

  19. Particulate contamination removal from wafers using plasmas and mechanical agitation

    DOEpatents

    Selwyn, Gary S.

    1998-01-01

    Particulate contamination removal from wafers using plasmas and mechanical agitation. The present invention includes the use of plasmas with mechanical agitation for removing particulate matter from the surface of a wafer. The apparatus hereof comprises a mechanical activator, at least one conducting contact pin for transferring the vibration from the activator to the wafer, clamp fingers that maintain the wafer's position, and means for generating a plasma in the vicinity of the surface of the wafer, all parts of the cleaning apparatus except the mechanical activator and part of the contact pin being contained inside the processing chamber. By exposing a wafer to a plasma and providing motion thereto in a direction perpendicular to its surface, the bonding between the particulate matter and the surface may be overcome. Once free of the wafer surface, the particulates become charged by electrons from the plasma and are drawn into the plasma by attractive forces which keep them from redepositing. The introduction of a flowing gas through the plasma sweeps the particulates away from the wafer and out of the plasma. The entire surface is cleaned during one cleaning step. The use of an rf plasma to accomplish the particulate removal was found to remove more than 90% of the particulates.

  20. Piezoresistive stress sensors on (110) silicon wafers

    NASA Technical Reports Server (NTRS)

    Kang, Y. L.; Suhling, J. C.; Jaeger, R. C.

    1992-01-01

    Structural reliability of electronic packages has become an increasing concern for a variety of reasons including the advent of higher integrated circuit densities, power density levels, and operating temperatures. A powerful method for experimental evaluation of die stress distributions is the use of test chips incorporating integral piezoresistive sensors. In this paper, the basic equations needed for the design of stress sensors fabricated on the surface of (110) oriented silicon wafers have been presented. Several sensor rosette configurations have been explored, including the familiar three-element 0-45-90 rosette. Rosette designs have been found which minimize the necessary calibration procedures and permit more stress components to be measured. It has been established that stress sensors on the surface of (110) test chips are sensitive to four out of the six stress components at a point.

  1. Wafer Mapping Using Deuterium Enhanced Defect Characterization

    NASA Astrophysics Data System (ADS)

    Hossain, K.; Holland, O. W.; Hellmer, R.; Vanmil, B.; Bubulac, L. O.; Golding, T. D.

    2010-07-01

    Deuterium (as well as other hydrogen isotopes) binds with a wide range of morphological defects in semiconductors and, as such, becomes distributed similarly to those defects. Thus, the deuterium profile within the sample serves as the basis of a technique for defect mapping known as amethyst wafer mapping (AWM). The efficiency of this technique has been demonstrated by evaluation of ion-induced damage in implanted Si, as well as as-grown defects in HgCdTe (MCT) epilayers. The defect tagging or decoration capability of deuterium is largely material independent and applicable to a wide range of defect morphologies. A number of analytical techniques including ion channeling and etch pit density measurements were used to evaluate the AWM results.

  2. Vertical integration of array-type miniature interferometers at wafer level by using multistack anodic bonding

    NASA Astrophysics Data System (ADS)

    Wang, Wei-Shan; Wiemer, Maik; Froemel, Joerg; Enderlein, Tom; Gessner, Thomas; Lullin, Justine; Bargiel, Sylwester; Passilly, Nicolas; Albero, Jorge; Gorecki, Christophe

    2016-04-01

    In this work, vertical integration of miniaturized array-type Mirau interferometers at wafer level by using multi-stack anodic bonding is presented. Mirau interferometer is suitable for MEMS metrology and for medical imaging according to its vertical-, lateral- resolutions and working distances. Miniaturized Mirau interferometer can be a promising candidate as a key component of an optical coherence tomography (OCT) system. The miniaturized array-type interferometer consists of a microlens doublet, a Si-based MEMS Z scanner, a spacer for focus-adjustment and a beam splitter. Therefore, bonding technologies which are suitable for heterogeneous substrates are of high interest and necessary for the integration of MEMS/MOEMS devices. Multi-stack anodic bonding, which meets the optical and mechanical requirements of the MOEMS device, is adopted to integrate the array-type interferometers. First, the spacer and the beam splitter are bonded, followed by bonding of the MEMS Z scanner. In the meanwhile, two microlenses, which are composed of Si and glass wafers, are anodically bonded to form a microlens doublet. Then, the microlens doublet is aligned and bonded with the scanner/spacer/beam splitter stack. The bonded array-type interferometer is a 7- wafer stack and the thickness is approximately 5mm. To separate such a thick wafer stack with various substrates, 2-step laser cutting is used to dice the bonded stack into Mirau chips. To simplify fabrication process of each component, electrical connections are created at the last step by mounting a Mirau chip onto a flip chip PCB instead of through wafer vias. Stability of Au/Ti films on the MEMS Z scanner after anodic bonding, laser cutting and flip chip bonding are discussed as well.

  3. Low-temperature vacuum hermetic wafer-level package for uncooled microbolometer FPAs

    NASA Astrophysics Data System (ADS)

    Garcia-Blanco, S.; Topart, P.; Desroches, Y.; Caron, J. S.; Williamson, F.; Alain, C.; Jerominek, H.

    2008-02-01

    Micro-Electro-Mechanical Systems (MEMS) packaging constitutes most of the cost of such devices. For the integration of MEMS with microelectronics systems to be widespread, a drastic reduction of the overall price is required. Wafer-level-packaging allows a fundamental reduction of the packaging cost by combining wafer-level microfabrication techniques with wafer-to-wafer bonding. To achieve the vacuum atmosphere required for the operation of many MEMS devices, bonding techniques such as anodic bonding, eutectic bonding, fusion bonding and gold to gold thermocompression bonding have been utilized, which require relatively high temperatures (>300°C) being in some cases incompatible with MEMS and microelectronics devices. Furthermore, to maintain vacuum integrity over long periods of time, getters requiring high activation temperatures are usually employed. INO has developed a hybrid wafer-level micropackaging technology based on low temperature fluxless solder joints in which the micropackaged MEMS device is not exposed to a temperature over 150°C. The micropackages have been designed for 160×120 microbolometer FPAs. Ceramic spacers are patterned by standard microfabrication techniques followed by laser micromachining. AR-coated floatzone silicon IR windows are patterned with a solderable layer. Both, microbolometer dies and windows are soldered to the ceramic tray by a combination of solder paste stencil printing, reflow and fluxless flip-chip bonding. A low temperature getter is also introduced to control outgassing of moisture and CO II during the lifetime of the package. Vacuum sealing is carried out by locally heating the vacuum port after bake out of the micropackages. In this paper, the vacuum integrity of micropackaged FPA dies will be reported. Base pressures as low as 5 mTorr and equivalent flow rates at room temperature of 4×10 -14 Torr.l/s without getter incorporation have been demonstrated using integrated micro-pressure gauges. A study of the

  4. Reduction of Thermal Conductivity in Wafer-Bonded Silicon

    SciTech Connect

    ZL Liau; LR Danielson; PM Fourspring; L Hu; G Chen; GW Turner

    2006-11-27

    Blocks of silicon up to 3-mm thick have been formed by directly bonding stacks of thin wafer chips. These stacks showed significant reductions in the thermal conductivity in the bonding direction. In each sample, the wafer chips were obtained by polishing a commercial wafer to as thin as 36 {micro}m, followed by dicing. Stacks whose starting wafers were patterned with shallow dots showed greater reductions in thermal conductivity. Diluted-HF treatment of wafer chips prior to bonding led to the largest reduction of the effective thermal conductivity, by approximately a factor of 50. Theoretical modeling based on restricted conduction through the contacting dots and some conduction across the planar nanometer air gaps yielded fair agreement for samples fabricated without the HF treatment.

  5. Backside EBR process performance with various wafer properties

    NASA Astrophysics Data System (ADS)

    Goto, Tomohiro; Shigemori, Kazuhito; Vangheluwe, Rik; Erich, Daub; Sanada, Masakazu

    2009-03-01

    In immersion lithography process, film stacking architecture will be necessary to avoid top coat film peeling. To achieve suitable stacking architecture for immersion lithography process, an EBR process that delivers tightly controlled film edge position and good uniformity around the wafer circumference is needed. We demonstrated a new bevel rinse system on a SOKUDO RF3 coat-and-develop track for immersion lithography. The performance of the new bevel rinse system for various wafer properties was evaluated. It was found that the bevel rinse system has a good controllability of film edge position and good uniformity around the wafer circumference. The results indicate that the bevel rinse system has a large margin for wafer centering accuracy, back side particles, wafer shape and substrates with good film edge position controllability, uniformity and clean apex. The system has been demonstrated to provide a suitable film stacking architecture for immersion lithography mass production process.

  6. Towards an Analogue Neuromorphic VLSI Instrument for the Sensing of Complex Odours

    NASA Astrophysics Data System (ADS)

    Ab Aziz, Muhammad Fazli; Harun, Fauzan Khairi Che; Covington, James A.; Gardner, Julian W.

    2011-09-01

    Almost all electronic nose instruments reported today employ pattern recognition algorithms written in software and run on digital processors, e.g. micro-processors, microcontrollers or FPGAs. Conversely, in this paper we describe the analogue VLSI implementation of an electronic nose through the design of a neuromorphic olfactory chip. The modelling, design and fabrication of the chip have already been reported. Here a smart interface has been designed and characterised for thisneuromorphic chip. Thus we can demonstrate the functionality of the a VLSI neuromorphic chip, producing differing principal neuron firing patterns to real sensor response data. Further work is directed towards integrating 9 separate neuromorphic chips to create a large neuronal network to solve more complex olfactory problems.

  7. WARP: Weight Associative Rule Processor. A dedicated VLSI fuzzy logic megacell

    NASA Technical Reports Server (NTRS)

    Pagni, A.; Poluzzi, R.; Rizzotto, G. G.

    1992-01-01

    During the last five years Fuzzy Logic has gained enormous popularity in the academic and industrial worlds. The success of this new methodology has led the microelectronics industry to create a new class of machines, called Fuzzy Machines, to overcome the limitations of traditional computing systems when utilized as Fuzzy Systems. This paper gives an overview of the methods by which Fuzzy Logic data structures are represented in the machines (each with its own advantages and inefficiencies). Next, the paper introduces WARP (Weight Associative Rule Processor) which is a dedicated VLSI megacell allowing the realization of a fuzzy controller suitable for a wide range of applications. WARP represents an innovative approach to VLSI Fuzzy controllers by utilizing different types of data structures for characterizing the membership functions during the various stages of the Fuzzy processing. WARP dedicated architecture has been designed in order to achieve high performance by exploiting the computational advantages offered by the different data representations.

  8. A new VLSI architecture for a single-chip-type Reed-Solomon decoder

    NASA Technical Reports Server (NTRS)

    Hsu, I. S.; Truong, T. K.

    1989-01-01

    A new very large scale integration (VLSI) architecture for implementing Reed-Solomon (RS) decoders that can correct both errors and erasures is described. This new architecture implements a Reed-Solomon decoder by using replication of a single VLSI chip. It is anticipated that this single chip type RS decoder approach will save substantial development and production costs. It is estimated that reduction in cost by a factor of four is possible with this new architecture. Furthermore, this Reed-Solomon decoder is programmable between 8 bit and 10 bit symbol sizes. Therefore, both an 8 bit Consultative Committee for Space Data Systems (CCSDS) RS decoder and a 10 bit decoder are obtained at the same time, and when concatenated with a (15,1/6) Viterbi decoder, provide an additional 2.1-dB coding gain.

  9. Radiation-tolerant 50MHz bulk CMOS VLSI circuits utilizing radiation-hard structure NMOS transistors

    SciTech Connect

    Hatano, H.; Takatsuka

    1986-10-01

    A radiation-tolerant, high speed, bulk CMOS VLSI circuit design, utilizing a new NMOS structure, has been investigated, based on ..gamma..-ray irradiation experimental results for 2 ..mu..m shift registers. By utilizing 60-bit clocked gate and transfer gate static shift register circuits, the usefulness of radiation-hard NMOS structure and circuit design parameter optimization has been confirmed experimentally, showing 50 MHZ operation CMOS circuits at 5 V supply voltage after 1 x 10/sup 5/ rads (Si) irradiation. The limitations of dynamic circuits in radiation-tolerant circuit designs have also been shown, using 120-bit dynamic shift register circuits. Based on the above results, radiation-tolerant, high-performance, bulk CMOS VLSI circuit designs are discussed.

  10. A new VLSI architecture for a single-chip-type Reed-Solomon decoder

    NASA Astrophysics Data System (ADS)

    Hsu, I. S.; Truong, T. K.

    1989-02-01

    A new very large scale integration (VLSI) architecture for implementing Reed-Solomon (RS) decoders that can correct both errors and erasures is described. This new architecture implements a Reed-Solomon decoder by using replication of a single VLSI chip. It is anticipated that this single chip type RS decoder approach will save substantial development and production costs. It is estimated that reduction in cost by a factor of four is possible with this new architecture. Furthermore, this Reed-Solomon decoder is programmable between 8 bit and 10 bit symbol sizes. Therefore, both an 8 bit Consultative Committee for Space Data Systems (CCSDS) RS decoder and a 10 bit decoder are obtained at the same time, and when concatenated with a (15,1/6) Viterbi decoder, provide an additional 2.1-dB coding gain.

  11. Learning and optimization with cascaded VLSI neural network building-block chips

    NASA Technical Reports Server (NTRS)

    Duong, T.; Eberhardt, S. P.; Tran, M.; Daud, T.; Thakoor, A. P.

    1992-01-01

    To demonstrate the versatility of the building-block approach, two neural network applications were implemented on cascaded analog VLSI chips. Weights were implemented using 7-b multiplying digital-to-analog converter (MDAC) synapse circuits, with 31 x 32 and 32 x 32 synapses per chip. A novel learning algorithm compatible with analog VLSI was applied to the two-input parity problem. The algorithm combines dynamically evolving architecture with limited gradient-descent backpropagation for efficient and versatile supervised learning. To implement the learning algorithm in hardware, synapse circuits were paralleled for additional quantization levels. The hardware-in-the-loop learning system allocated 2-5 hidden neurons for parity problems. Also, a 7 x 7 assignment problem was mapped onto a cascaded 64-neuron fully connected feedback network. In 100 randomly selected problems, the network found optimal or good solutions in most cases, with settling times in the range of 7-100 microseconds.

  12. VLSI architectures for computing multiplications and inverses in GF(2m).

    PubMed

    Wang, C C; Truong, T K; Shao, H M; Deutsch, L J; Omura, J K; Reed, I S

    1985-08-01

    Finite field arithmetic logic is central in the implementation of Reed-Solomon coders and in some cryptographic algorithms. There is a need for good multiplication and inversion algorithms that can be easily realized on VLSI chips. Massey and Omura recently developed a new multiplication algorithm for Galois fields based on a normal basis representation. In this paper, a pipeline structure is developed to realize the Massey-Omura multiplier in the finite field GF(2m). With the simple squaring property of the normal basis representation used together with this multiplier, a pipeline architecture is developed for computing inverse elements in GF(2m). The designs developed for the Massey-Omura multiplier and the computation of inverse elements are regular, simple, expandable, and therefore, naturally suitable for VLSI implementation. PMID:11539660

  13. VLSI architectures for computing multiplications and inverses in GF(2-m)

    NASA Technical Reports Server (NTRS)

    Wang, C. C.; Truong, T. K.; Shao, H. M.; Deutsch, L. J.; Omura, J. K.; Reed, I. S.

    1983-01-01

    Finite field arithmetic logic is central in the implementation of Reed-Solomon coders and in some cryptographic algorithms. There is a need for good multiplication and inversion algorithms that are easily realized on VLSI chips. Massey and Omura recently developed a new multiplication algorithm for Galois fields based on a normal basis representation. A pipeline structure is developed to realize the Massey-Omura multiplier in the finite field GF(2m). With the simple squaring property of the normal-basis representation used together with this multiplier, a pipeline architecture is also developed for computing inverse elements in GF(2m). The designs developed for the Massey-Omura multiplier and the computation of inverse elements are regular, simple, expandable and, therefore, naturally suitable for VLSI implementation.

  14. VLSI architectures for computing multiplications and inverses in GF(2m)

    NASA Technical Reports Server (NTRS)

    Wang, C. C.; Truong, T. K.; Shao, H. M.; Deutsch, L. J.; Omura, J. K.

    1985-01-01

    Finite field arithmetic logic is central in the implementation of Reed-Solomon coders and in some cryptographic algorithms. There is a need for good multiplication and inversion algorithms that are easily realized on VLSI chips. Massey and Omura recently developed a new multiplication algorithm for Galois fields based on a normal basis representation. A pipeline structure is developed to realize the Massey-Omura multiplier in the finite field GF(2m). With the simple squaring property of the normal-basis representation used together with this multiplier, a pipeline architecture is also developed for computing inverse elements in GF(2m). The designs developed for the Massey-Omura multiplier and the computation of inverse elements are regular, simple, expandable and, therefore, naturally suitable for VLSI implementation.

  15. A VLSI chip set for real time vector quantization of image sequences

    NASA Technical Reports Server (NTRS)

    Baker, Richard L.

    1989-01-01

    The architecture and implementation of a VLSI chip set that vector quantizes (VQ) image sequences in real time is described. The chip set forms a programmable Single-Instruction, Multiple-Data (SIMD) machine which can implement various vector quantization encoding structures. Its VQ codebook may contain unlimited number of codevectors, N, having dimension up to K = 64. Under a weighted least squared error criterion, the engine locates at video rates the best code vector in full-searched or large tree searched VQ codebooks. The ability to manipulate tree structured codebooks, coupled with parallelism and pipelining, permits searches in as short as O (log N) cycles. A full codebook search results in O(N) performance, compared to O(KN) for a Single-Instruction, Single-Data (SISD) machine. With this VLSI chip set, an entire video code can be built on a single board that permits realtime experimentation with very large codebooks.

  16. A cost-effective methodology for the design of massively-parallel VLSI functional units

    NASA Technical Reports Server (NTRS)

    Venkateswaran, N.; Sriram, G.; Desouza, J.

    1993-01-01

    In this paper we propose a generalized methodology for the design of cost-effective massively-parallel VLSI Functional Units. This methodology is based on a technique of generating and reducing a massive bit-array on the mask-programmable PAcube VLSI array. This methodology unifies (maintains identical data flow and control) the execution of complex arithmetic functions on PAcube arrays. It is highly regular, expandable and uniform with respect to problem-size and wordlength, thereby reducing the communication complexity. The memory-functional unit interface is regular and expandable. Using this technique functional units of dedicated processors can be mask-programmed on the naked PAcube arrays, reducing the turn-around time. The production cost of such dedicated processors can be drastically reduced since the naked PAcube arrays can be mass-produced. Analysis of the the performance of functional units designed by our method yields promising results.

  17. Design Study of Wafer Seals for Future Hypersonic Vehicles

    NASA Technical Reports Server (NTRS)

    Dunlap, Patrick H.; Finkbeiner, Joshua R.; Steinetz, Bruce M.; DeMange, Jeffrey J.

    2005-01-01

    Future hypersonic vehicles require high temperature, dynamic seals in advanced hypersonic engines and on the vehicle airframe to seal the perimeters of movable panels, flaps, and doors. Current seals do not meet the demanding requirements of these applications, so NASA Glenn Research Center is developing improved designs to overcome these shortfalls. An advanced ceramic wafer seal design has shown promise in meeting these needs. Results from a design of experiments study performed on this seal revealed that several installation variables played a role in determining the amount of leakage past the seals. Lower leakage rates were achieved by using a tighter groove width around the seals, a higher seal preload, a tighter wafer height tolerance, and a looser groove length. During flow testing, a seal activating pressure acting behind the wafers combined with simulated vibrations to seat the seals more effectively against the sealing surface and produce lower leakage rates. A seal geometry study revealed comparable leakage for full-scale wafers with 0.125 and 0.25 in. thicknesses. For applications in which lower part counts are desired, fewer 0.25-in.-thick wafers may be able to be used in place of 0.125-in.-thick wafers while achieving similar performance. Tests performed on wafers with a rounded edge (0.5 in. radius) in contact with the sealing surface resulted in flow rates twice as high as those for wafers with a flat edge. Half-size wafers had leakage rates approximately three times higher than those for full-size wafers.

  18. Rapid defect detections of bonded wafer using near infrared polariscope

    NASA Astrophysics Data System (ADS)

    Ng, Chi Seng; Asundi, Anand K.

    2011-10-01

    In modern field of microelectronics and MEMS, wafer bonding has emerged as an important processing step in wide range of manufacturing applications. During the manufacturing process, even in the modern clean room, small defects result from trapped particles and gas bubbles exist at bonded interface. Defects and trapped particles may exist on the top and bottom of the wafers, or at the interface of bonded wafer pair. These inclusions will generate high stress around debond region at the wafers bonded interface. In this paper, inspection at the bonded interface will be the interest of investigation. Since silicon wafer is opaque to visible light, defect detection at the bonded interface of silicon wafer is not possible. Due to the fact that silicon wafer is transparent to wavelength greater than 1150nm, an Near Infrared Polariscope which has showed some promises on residual stress measurement on silicon devices has been adapted and developed. This method is based on the well known photoelastic principles, where the stress variations are measured based on the changes of light propagation velocity in birefringence material. The results are compared and contrast with conventional Infrared Transmission Imaging tool (IRT) which is widely used to inspect the bonded silicon wafer. In this research, the trapped particles that are not visible via conventional infrared transmission method are identified via the generated residual stress pattern. The magnitude of the residual stress fields associated with each defect is examined qualitatively and quantitatively. The stress field generated at the wafers bonded interface will looks like a 'butterfly' pattern. Wafer pairs Pyrex-Si and Si-Si bonded interface will be examined.

  19. Application of a VLSI vector quantization processor to real-time speech coding

    NASA Technical Reports Server (NTRS)

    Davidson, G.; Gersho, A.

    1986-01-01

    Attention is given to a working vector quantization processor for speech coding that is based on a first-generation VLSI chip which efficiently performs the pattern-matching operation needed for the codebook search process (CPS). Using this chip, the CPS architecture has been successfully incorporated into a compact, single-board Vector PCM implementation operating at 7-18 kbits/sec. A real time Adaptive Vector Predictive Coder system using the CPS has also been implemented.

  20. A VLSI design for universal noiseless coding. [for spacecraft imaging equipment

    NASA Technical Reports Server (NTRS)

    Lee, Jun-Ji; Fang, Wai-Chi; Rice, Robert F.

    1988-01-01

    The practical, noiseless and efficient data-compression technique presented involves a conceptual VLSI design which is capable of meeting real-time processing rates and meets low-power, low-weight, and small-volume requirements. This form of data compression is applicable to image data compression aboard future low-budget spaceflight missions, for such instruments as visual-IR mapping spectrometers and high-resolution imaging spectrometers.

  1. A Systolic VLSI Design of a Pipeline Reed-solomon Decoder

    NASA Technical Reports Server (NTRS)

    Shao, H. M.; Truong, T. K.; Deutsch, L. J.; Yuen, J. H.; Reed, I. S.

    1984-01-01

    A pipeline structure of a transform decoder similar to a systolic array was developed to decode Reed-Solomon (RS) codes. An important ingredient of this design is a modified Euclidean algorithm for computing the error locator polynomial. The computation of inverse field elements is completely avoided in this modification of Euclid's algorithm. The new decoder is regular and simple, and naturally suitable for VLSI implementation.

  2. A VLSI single chip (255,223) Reed-Solomon encoder with interleaver

    NASA Technical Reports Server (NTRS)

    Hsu, I. S.; Deutsch, L. J.; Truong, T. K.; Reed, I. S.

    1987-01-01

    A single-chip implementation of a Reed-Solomon encoder with interleaving capability is described. The code used was adapted by the CCSDS (Consulative Committee on Space Data Systems). It forms the outer code of the NASA standard concatenated coding system which includes a convolutional inner code of rate 1/2 and constraint length 7. The architecture, leading to this single VLSI chip design, makes use of a bit-serial finite field multiplication algorithm due to E.R. Berlekamp.

  3. Step and flash imprint process integration techniques for photonic crystal patterning: template replication through wafer patterning irrespective of tone

    NASA Astrophysics Data System (ADS)

    Miller, Mike; Brooks, Cindy; Lentz, David; Doyle, Gary; Resnick, Doug; LaBrake, Dwayne

    2008-02-01

    Photonic crystal structures in for example light emitting diodes (LED) have been demonstrated to improve performance by preferential mode coupling near the surface of the diode.1 Such demonstrations were limited by using direct write e-beam lithography due to long write times, a single tone and only small areas patterned for study. S-FIL technology provides a means to pattern entire wafers in a single imprint step using templates replicated by step and repeat (S&R) imprint2. Large area template replication by S-FIL/R has been described using S&R templates 3. Photonic crystal based LED manufacturers prefer holes in substrates requiring pillar tone templates for S-FIL patterning. Pillar tone templates are not easily derived from the preferred e-beam tone for sub-200 nm template fabrication. Therefore step and repeat and/or whole wafer template replication by the combination of S-FIL and/or S-FIL/R can be used to produce the desired working template tone. These processes further enable the desired tone and wafer die layout for fully patterning wafers to their edge with no missing die or edge fields. The advantages of using S-FIL processes for template and wafer patterning are clear in that there is no tone preference required by the original e-beam generated pattern, which allows the preferred positive tone to be used for e-beam patterning of templates. The present work will describe template replication processes for the fabrication of either pillar or hole tone templates and subsequent wafer pattern processes, through oxide hard mask, producing both pillar and hole tone patterns. In summary process flows exist so that any e-beam written template tone can be used to produce either tone in replicated templates and/or patterned wafers.

  4. Compensating Inhomogeneities of Neuromorphic VLSI Devices Via Short-Term Synaptic Plasticity

    PubMed Central

    Bill, Johannes; Schuch, Klaus; Brüderle, Daniel; Schemmel, Johannes; Maass, Wolfgang; Meier, Karlheinz

    2010-01-01

    Recent developments in neuromorphic hardware engineering make mixed-signal VLSI neural network models promising candidates for neuroscientific research tools and massively parallel computing devices, especially for tasks which exhaust the computing power of software simulations. Still, like all analog hardware systems, neuromorphic models suffer from a constricted configurability and production-related fluctuations of device characteristics. Since also future systems, involving ever-smaller structures, will inevitably exhibit such inhomogeneities on the unit level, self-regulation properties become a crucial requirement for their successful operation. By applying a cortically inspired self-adjusting network architecture, we show that the activity of generic spiking neural networks emulated on a neuromorphic hardware system can be kept within a biologically realistic firing regime and gain a remarkable robustness against transistor-level variations. As a first approach of this kind in engineering practice, the short-term synaptic depression and facilitation mechanisms implemented within an analog VLSI model of I&F neurons are functionally utilized for the purpose of network level stabilization. We present experimental data acquired both from the hardware model and from comparative software simulations which prove the applicability of the employed paradigm to neuromorphic VLSI devices. PMID:21031027

  5. Fault-sensitivity and wear-out analysis of VLSI systems

    NASA Astrophysics Data System (ADS)

    Choi, Gwan S.

    1995-06-01

    This thesis describes simulation approaches to conduct fault sensitivity and wear-out failure analysis of VLSI systems. A fault-injection approach to study transient impact in VLSI systems is developed. Through simulated fault injection at the device level and subsequent fault propagation at the gate, functional and software levels, it is possible to identify critical bottlenecks in dependability. Techniques to speed up the fault simulation and to perform statistical analysis of fault impact are developed. A wear-out simulation environment is also developed to closely mimic dynamic sequences of wear-out events in a device through time, to localize weak location/aspect of target chip and to allow generation of Time-to-Failure (TTF) distribution of a VLSI chip as whole. First, an accurate simulation of a target chip and its application code is performed to acquire real workload trace data on switch activity. Then, using this switch activity information, wear-out of the each component of the chip is simulated using Monte Carlo techniques.

  6. Design Implementation and Testing of a VLSI High Performance ASIC for Extracting the Phase of a Complex Signal

    NASA Astrophysics Data System (ADS)

    Altmeyer, Ronald C.

    2002-09-01

    This thesis documents the research, circuit design, and simulation testing of a VLSI (Very Large Scale Integration) ASIC which extracts phase angle information from a complex sampled signal using the arctangent relationship: (phi=tan/-1 (Q/1). Specifically, the circuit will convert the In-Phase and Quadrature terms into their corresponding phase angle. The design specifications were to implement the design in CMOS (Complementary Metal Oxide Semiconductors) technology with a minimum transistor count and ability to operate at a clock frequency of 700 MHz. Research on the arctangent function was performed to determine mathematical calculation methods and the CORDIC method was chosen to achieve the stated design specifications. MATLAB simulations were used to calculate and verify accuracy and to implement Quine-McClusky logic minimization. T-SPICE netlists were generated and simulations were run to determine transistor and circuit electrical operation and timing. Finally, overall circuit logic functionality of all possible input combinations was completed using a VHDL (VHSIC(Very High Speed Integrated Circuit) Hardware Description Language) simulation program.

  7. CMOS VLSI pilot and support chip for a liquid crystal on silicon 8x8 optical cross connect

    NASA Astrophysics Data System (ADS)

    Lelah, Alan; Vinouze, Bruno; Martel, Gilbert; Perez-Segovia, Tomas; Geoffroy, Philippe; Laval, Jean-Paul; Jayet, Philippe; Senn, Patrice; Gravey, Philippe; Wolffer, Nicole; Lever, Roger; Tan, Antione

    2001-12-01

    With the explosion of Internet and multi-service traffic, telecommunication transport networks today are turning to Wavelength Division Multiplexing. Optical cross-connects (OXCs) allow flexible rerouting of wavelength channels. It has been shown that 2-D free-space beam deflection by nematic liquid crystal gratings provide a good solution for the realization of optical switches in OXCs. Operating in the telecom 1.5 micrometers wavelength region they serve as an active holographic element. Liquid Crystal on Silicon (LCOS) combined with VLSI technologies allow the fabrication of large capacity, low cost and low consumption compact free-space switches. An N X N optical switch can be built by cascading two LCOS-based spatial light modulators (SLMs). The first part of the paper describes a circuit that provides the physical support as well as piloting circuitry for such SLMs. It is capable of piloting beams from a linear array of 8 incoming fibers towards a similar array of 8 outgoing fibers. The electrode command voltages are analog while the external interface as well as on-chip memory is digital. The chip has been implemented in a CMOS 0.5 (mu) process with 600,000 transistors while die size is 320 mm2 (80 mm2 active area).

  8. Mixed-Dimensionality VLSI-Type Configurable Tools for Virtual Prototyping of Biomicrofluidic Devices and Integrated Systems

    NASA Astrophysics Data System (ADS)

    Makhijani, Vinod B.; Przekwas, Andrzej J.

    2002-10-01

    This report presents results of a DARPA/MTO Composite CAD Project aimed to develop a comprehensive microsystem CAD environment, CFD-ACE+ Multiphysics, for bio and microfluidic devices and complete microsystems. The project began in July 1998, and was a three-year team effort between CFD Research Corporation, California Institute of Technology (CalTech), University of California, Berkeley (UCB), and Tanner Research, with Mr. Don Verlee from Abbott Labs participating as a consultant on the project. The overall objective of this project was to develop, validate and demonstrate several applications of a user-configurable VLSI-type mixed-dimensionality software tool for design of biomicrofluidics devices and integrated systems. The developed tool would provide high fidelity 3-D multiphysics modeling capability, l-D fluidic circuits modeling, and SPICE interface for system level simulations, and mixed-dimensionality design. It would combine tools for layouts and process fabrication, geometric modeling, and automated grid generation, and interfaces to EDA tools (e.g. Cadence) and MCAD tools (e.g. ProE).

  9. Ultra-Low Noise HEMT Device Models: Application of On-Wafer Cryogenic Noise Analysis and Improved Parameter Extraction Techniques

    NASA Technical Reports Server (NTRS)

    Bautista, J. J.; Hamai, M.; Nishimoto, M.; Laskar, J.; Szydlik, P.; Lai, R.

    1995-01-01

    Significant advances in the development of HEMT technology have resulted in high performance cryogenic low noise amplifiers whose noise temperatures are within an order of magnitude of the quantum noise limit. Key to the identification of optimum HEMT structures at cryogenic temperatures is the development of on-wafer noise and device parameter extraction techniques. Techniques and results are described.

  10. Wafer-level filling of microfabricated atomic vapor cells based on thin-film deposition and photolysis of cesium azide

    SciTech Connect

    Liew, Li-Anne; Moreland, John; Gerginov, Vladislav

    2007-03-12

    The thin-film deposition and photodecomposition of cesium azide are demonstrated and used to fill arrays of miniaturized atomic resonance cells with cesium and nitrogen buffer gas for chip-scale atomic-based instruments. Arrays of silicon cells are batch fabricated on wafers into which cesium azide is deposited by vacuum thermal evaporation. After vacuum sealing, the cells are irradiated with ultraviolet radiation, causing the azide to photodissociate into pure cesium and nitrogen in situ. This technology integrates the vapor-cell fabrication and filling procedures into one continuous and wafer-level parallel process, and results in cells that are optically transparent and chemically pure.

  11. Development of optical automatic positioning and wafer defect detection system

    NASA Astrophysics Data System (ADS)

    Tien, Chuen-Lin; Lai, Qun-Huang; Lin, Chern-Sheng

    2016-02-01

    The data of a wafer with defects can provide engineers with very important information and clues to improve the yield rate and quality in manufacturing. This paper presents a microscope automatic positioning and wafer detection system with human-machine interface based on image processing and fuzzy inference algorithms. In the proposed system, a XY table is used to move the position of each die on 6 inch or 8 inch wafers. Then, a high-resolution CCD and one set of two-axis optical linear encoder are used to accurately measure the position on the wafer. Finally, the developed human-machine interface is used to display the current position of an actual wafer in order to complete automatic positioning, and a wafer map database can be created. In the process of defect detection, CCD is used for image processing, and during preprocessing, it is required to filter noise, acquire the defect characteristics, define the defective template, and then take the characteristic points of the defective template as the reference input for fuzzy inference. A high-accuracy optical automatic positioning and wafer defect detection system is thus constructed. This study focused on automatic detection of spots, scratches, and bruises, and attempted to reduce the time to detect defective die and improve the accuracy of determining the defects of semiconductor devices.

  12. Multifunctional medicated lyophilised wafer dressing for effective chronic wound healing.

    PubMed

    Pawar, Harshavardhan V; Boateng, Joshua S; Ayensu, Isaac; Tetteh, John

    2014-06-01

    Wafers combining weight ratios of Polyox with carrageenan (75/25) or sodium alginate (50/50) containing streptomycin and diclofenac were prepared to improve chronic wound healing. Gels were freeze-dried using a lyophilisation cycle incorporating an annealing step. Wafers were characterised for morphology, mechanical and in vitro functional (swelling, adhesion, drug release in the presence of simulated wound fluid) characteristics. Both blank (BLK) and drug-loaded (DL) wafers were soft, flexible, elegant in appearance and non-brittle in nature. Annealing helped to improve porous nature of wafers but was affected by the addition of drugs. Mechanical characterisation demonstrated that the wafers were strong enough to withstand normal stresses but also flexible to prevent damage to newly formed skin tissue. Differences in swelling, adhesion and drug release characteristics could be attributed to differences in pore size and sodium sulphate formed because of the salt forms of the two drugs. BLK wafers showed relatively higher swelling and adhesion than DL wafers with the latter showing controlled release of streptomycin and diclofenac. The optimised dressing has the potential to reduce bacterial infection and can also help to reduce swelling and pain associated with injury due to the anti-inflammatory action of diclofenac and help to achieve more rapid wound healing. PMID:24700434

  13. Techniques for the evaluation of outgassing from polymeric wafer pods

    SciTech Connect

    McIntyre, D.C.; Liang, A.; Thornberg, S.M.; Bender, S.F.; Lujan, R.D.; Blewer, R.S.; Bowers, W.D.

    1994-03-01

    In recent years there has been increasing interest in using wafer-level isolation environments or pods (microenvironments) to provide a more controllable, cleaner wafer environment during wafer processing. It has been shown that pods can be effective in reducing the amount of particulate contamination on wafers during manufacturing. However, there have also been studies that indicate that pods and wafer boxes can be the source of condensible, molecular organic contamination. This paper summarizes the work that has been performed during the past year at Sandia National Laboratories` Contamination Free Manufacturing Research Center (CFMRC) on (1) devising standard, low-temperature, high sensitivity techniques to detect outgassing of volatile organic compounds (VOCs) from polymers used to construct wafer pods and (2) development of a technique that can be used to continuously measure the condensible contamination within pods so that the pod environment can be monitored during manufacturing. Although these techniques have been developed specifically for assessing contamination threats from wafer pods, they can be used to evaluate other potential contamination sources. The high sensitivity outgassing techniques can be used to evaluate outgassing of volatiles from other clean-room materials and the real-time outgassing sensor can be used to monitor contamination condensation in non-pod environments such as ballroom-type cleanrooms and minienvironments.

  14. Wafer-level micro-optics: trends in manufacturing, testing, packaging, and applications

    NASA Astrophysics Data System (ADS)

    Voelkel, Reinhard; Gong, Li; Rieck, Juergen; Zheng, Alan

    2012-11-01

    Micro-optics is an indispensable key enabling technology (KET) for many products and applications today. Probably the most prestigious examples are the diffractive light shaping elements used in high-end DUV lithography steppers. Highly efficient refractive and diffractive micro-optical elements are used for precise beam and pupil shaping. Micro-optics had a major impact on the reduction of aberrations and diffraction effects in projection lithography, allowing a resolution enhancement from 250 nm to 45 nm within the last decade. Micro-optics also plays a decisive role in medical devices (endoscopes, ophthalmology), in all laser-based devices and fiber communication networks (supercomputer, ROADM), bringing high-speed internet to our homes (FTTH). Even our modern smart phones contain a variety of micro-optical elements. For example, LED flashlight shaping elements, the secondary camera, and ambient light and proximity sensors. Wherever light is involved, micro-optics offers the chance to further miniaturize a device, to improve its performance, or to reduce manufacturing and packaging costs. Wafer-scale micro-optics fabrication is based on technology established by semiconductor industry. Thousands of components are fabricated in parallel on a wafer. We report on the state of the art in wafer-based manufacturing, testing, packaging and present examples and applications for micro-optical components and systems.

  15. Investigation of optically injected charge carrier dynamics in silicon wafers using terahertz spectroscopic imaging

    NASA Astrophysics Data System (ADS)

    Arnold, Thomas; De Biasio, Martin; Muehleisen, Wolfgang; Leitner, Raimund

    2012-06-01

    Terahertz (THz) time-domain spectroscopy has proven to be a promising technology for a wide range of applications, such as inspection of nished products or materials, quality control, biomedical imaging and diagnostics, counterfeit detection and characterization of semiconductors. This paper investigates the applicability of THz time-domain spectroscopy for the characterization of silicon solar cell properties such as: conductivity, charge carrier mobility and density. Moreover, the possibilities for THz spectroscopy and imaging for the defect analysis in semiconductor and photovoltaic materials are investigated. THz-pump/THz-probe measurements were carried out on silicon wafers which were illuminated by a halogen light source to inject free charge carriers. Initial results indicate that THz time-domain spectroscopy is a promising technique for the characterization of silicon wafers for the photovoltaic industry.

  16. Wafer-level vacuum packaging for an optical readout bi-material cantilever infrared FPA

    NASA Astrophysics Data System (ADS)

    Li, Shuyu; Zhou, Xiaoxiong; Yu, Xiaomei

    2013-12-01

    In this paper, we report the design and fabrication of an uncooled infrared (IR) focal plane array (FPA) on quartz substrate and the wafer-level vacuum packaging for the IR FPA in view of an optical readout method. This FPA is composed of bi-material cantilever array which fabricated by the Micro-Electro Mechanical System (MEMS) technology, and the wafer-level packaging of the IR FPA is realized based on AuSn solder bonding technique. The interface of soldering is observed by scan electron microscope (SEM), which indicates that bonding interface is smooth and with no bubbles. The air leakage rate of packaged FPA is measured to be 1.3×10-9 atm·cc/s.

  17. The uses of Man-Made diamond in wafering applications

    NASA Technical Reports Server (NTRS)

    Fallon, D. B.

    1982-01-01

    The continuing, rapid growth of the semiconductor industry requires the involvement of several specialized industries in the development of special products geared toward the unique requirements of this new industry. A specialized manufactured diamond to meet various material removal needs was discussed. The area of silicon wafer slicing has presented yet anothr challenge and it is met most effectively. The history, operation, and performance of Man-Made diamond and particularly as applied to silicon wafer slicing is discussed. Product development is underway to come up with a diamond specifically for sawing silicon wafers on an electroplated blade.

  18. Ulnar Impaction Syndrome: Ulnar Shortening vs. Arthroscopic Wafer Procedure

    PubMed Central

    Smet, Luc De; Vandenberghe, Lore; Degreef, Ilse

    2014-01-01

    The outcome of ulnar shortenings was compared with that of arthroscopic wafer resections for ulnar impaction (or abutment) syndrome in patients with a positive ulnar variance. The outcome was measured by DASH score, visual analog scale for pain, and working incapacity. The mean DASH score in the ulnar shortening group was 26; in the wafer group it was 36. The VAS scores were respectively 4.4 and 4.6. The working incapacity was 7?months in the ulnar shortening group and 6.1 months in the wafer group. The differences between the two groups were not statistically significant. PMID:25032075

  19. Wafer warpage characterization measurement with modified fringe reflection method

    NASA Astrophysics Data System (ADS)

    Chang, Po-Yi; Ku, Yi-Sha

    2015-05-01

    We have demonstrated a modified fringe reflection method to compensate the warpage measurement errors caused by the height difference between optical reference mirror and wafer sample surface. We have used a linearity analysis approach to obtain the parabolic height errors for a 4-inch sapphire wafer warpage measurement, which is around 1.48 μm of 100 μm height difference. The experimental results shows the warp discrepancy of 6-inch sapphire wafer is less than 1 μm compared with the reference Tropel instrument.

  20. Photolithography diagnostic expert systems: a systematic approach to problem solving in a wafer fabrication facility

    NASA Astrophysics Data System (ADS)

    Weatherwax Scott, Caroline; Tsareff, Christopher R.

    1990-06-01

    One of the main goals of process engineering in the semiconductor industry is to improve wafer fabrication productivity and throughput. Engineers must work continuously toward this goal in addition to performing sustaining and development tasks. To accomplish these objectives, managers must make efficient use of engineering resources. One of the tools being used to improve efficiency is the diagnostic expert system. Expert systems are knowledge based computer programs designed to lead the user through the analysis and solution of a problem. Several photolithography diagnostic expert systems have been implemented at the Hughes Technology Center to provide a systematic approach to process problem solving. This systematic approach was achieved by documenting cause and effect analyses for a wide variety of processing problems. This knowledge was organized in the form of IF-THEN rules, a common structure for knowledge representation in expert system technology. These rules form the knowledge base of the expert system which is stored in the computer. The systems also include the problem solving methodology used by the expert when addressing a problem in his area of expertise. Operators now use the expert systems to solve many process problems without engineering assistance. The systems also facilitate the collection of appropriate data to assist engineering in solving unanticipated problems. Currently, several expert systems have been implemented to cover all aspects of the photolithography process. The systems, which have been in use for over a year, include wafer surface preparation (HMDS), photoresist coat and softbake, align and expose on a wafer stepper, and develop inspection. These systems are part of a plan to implement an expert system diagnostic environment throughout the wafer fabrication facility. In this paper, the systems' construction is described, including knowledge acquisition, rule construction, knowledge refinement, testing, and evaluation. The roles

  1. Analysis of the interdigitated back contact solar cells: The n-type substrate lifetime and wafer thickness

    NASA Astrophysics Data System (ADS)

    Zhang, Wei; Chen, Chen; Jia, Rui; Sun, Yun; Xing, Zhao; Jin, Zhi; Liu, Xin-Yu; Liu, Xiao-Wen

    2015-10-01

    The n-type silicon integrated-back contact (IBC) solar cell has attracted much attention due to its high efficiency, whereas its performance is very sensitive to the wafer of low quality or the contamination during high temperature fabrication processing, which leads to low bulk lifetime τbulk. In order to clarify the influence of bulk lifetime on cell characteristics, two-dimensional (2D) TCAD simulation, combined with our experimental data, is used to simulate the cell performances, with the wafer thickness scaled down under various τbulk conditions. The modeling results show that for the IBC solar cell with high τbulk, (such as 1 ms-2 ms), its open-circuit voltage Voc almost remains unchanged, and the short-circuit current density Jsc monotonically decreases as the wafer thickness scales down. In comparison, for the solar cell with low τbulk (for instance, < 500 μs) wafer or the wafer contaminated during device processing, the Voc increases monotonically but the Jsc first increases to a maximum value and then drops off as the wafer’s thickness decreases. A model combing the light absorption and the minority carrier diffusion is used to explain this phenomenon. The research results show that for the wafer with thinner thickness and high bulk lifetime, the good light trapping technology must be developed to offset the decrease in Jsc. Project supported by the Chinese Ministry of Science and Technology Projects (Grant Nos. 2012AA050304 and Y0GZ124S01), the National Natural Science Foundation of China (Grant Nos. 11104319, 11274346, 51202285, 51402347, and 51172268), and the Fund of the Solar Energy Action Plan from the Chinese Academy of Sciences (Grant Nos. Y3ZR044001 and Y2YF014001).

  2. Low-temperature full wafer adhesive bonding

    NASA Astrophysics Data System (ADS)

    Niklaus, Frank; Enoksson, Peter; Kälvesten, Edvard; Stemme, Göran

    2001-03-01

    We have systematically investigated the influence of different bonding parameters on void formation in a low-temperature adhesive bonding process. As a result of these studies we present guidelines for void free adhesive bonding of 10 cm diameter wafers. We have focused on polymer coatings with layer thicknesses between 1 µm and 18 µm. The tested polymer materials were benzocyclobutene (BCB) from Dow Chemical, a negative photoresist (ULTRA-i 300) and a positive photoresist (S1818) from Shipley, a polyimide (HTR3) from Arch Chemical and two different polyimides (PI2555 and PI2610) from DuPont. The polymer material, the bonding pressure and the pre-curing time and temperature for the polymer significantly influence void formation at the bond interface. High bonding pressure and optimum pre-curing times/temperatures counteract void formation. We present the process parameters to achieve void-free bonding with the BCB coating and with the ULTRA-i 300 photoresist coating as adhesive materials. Excellent void-free and strong bonds have been achieved by using BCB as the bonding material which requires a minimum bonding temperature of 180 °C.

  3. Direct to Digital Holography for Semiconductor Wafer Defect Detection and Review

    SciTech Connect

    ThomasJr., C. E.; Bahm, Tracy M.; Baylor, Larry R; Bingham, Philip R.; Burns, Steven W.; Chidley, Matthew D; Dai, Xiaolong; Delahanty, Robert J.; Doti, Christopher J.; El-Khashab, Ayman; Fisher, Robert L.; Gilbert, Judd M.; Cui, Hongtao; Goddard Jr, James Samuel; Hanson, Gregory R; Hickson, Joel D.; Hunt, Martin A.; Hylton, Kathy W; John, George C.; Jones, Michael L.; McDonald, Kenneth R.; Mayo, Michael W.; McMackin, Ian; Patek, David; Price, John H.; Rasmussen, David A; Schaefer, Louis J.; Scheidt, Thomas R.; Schulze, Mark A.; Schumaker, Philip D.; Shen, Bichuan; Smith, Randall G.; Su, Allen N.; Tobin Jr, Kenneth William; Usry, William R.; Voelkl, Edgar; Weber, Karsten S.; Jones, Paul G.; Owen, Robert W.

    2002-01-01

    A method for recording true holograms (not holographic interferometry) directly to a digital video medium in a single image has been invented. This technology makes the amplitude and phase for every pixel of the target object wave available. Since phase is proportional to wavelength, this makes high-resolution metrology an implicit part of the holographic recording. Measurements of phase can be made to one hundredth or even one thousandth of a wavelength, so the technology is attractive for finding defects on semiconductor wafers, where feature sizes are now smaller than the wavelength of even deep ultra-violet light.

  4. Fast wafer-level detection and control of interconnect reliability

    NASA Astrophysics Data System (ADS)

    Foley, Sean; Molyneaux, James; Mathewson, Alan

    2000-08-01

    Many of the technological advances in the semiconductor industry have led to dramatic increases in device density and performance in conjunction with enhanced circuit reliability. As reliability is improved, the time taken to characterize particular failure modes with traditional test methods is getting substantially longer. Furthermore, semiconductor customers expect low product cost and fast time-to-market. The limits of traditional reliability testing philosophies are being reached and new approaches need to be investigated to enable the next generation of highly reliable products to be tested. This is especially true in the area of IC interconnect, where significant challenges are predicted for the next decade. A number of fast, wafer level test methods exist for interconnect reliability evaluation. The relative abilities of four such methods to detect the quality and reliability of IC interconnect over very short test times are evaluated in this work. Four different test structure designs are also evaluated and the results are bench-marked against conventional package level Median Time to Failure results. The Isothermal test method combine with SWEAT-type test structures is shown to be the most suitable combination for defect detection and interconnect reliability control over very short test times.

  5. A study on wafer level vacuum packaging for MEMS devices

    NASA Astrophysics Data System (ADS)

    Lee, Byeungleul; Seok, Seonho; Chun, Kukjin

    2003-09-01

    A new vacuum packaging process at the wafer level is developed for the surface micromachining devices using glass-silicon anodic bonding technology. The rim for the glass-silicon bonding process which is needed to prevent vacuum leakage is built up simultaneously as the structure is being etched. The mechanical resonator is used as a tool for evaluating the vacuum level of the packaging. The inside pressure of the packaged device was measured indirectly by measuring the quality factor of the mechanical resonator. The measured Q factor was about 5 × 104 and the estimated inner pressure was about 1 mTorr. It is also possible to change the inside pressure of the packaged devices from 2 Torr to 1 mTorr by varying the amount of Ti getter material. The yield of the vacuum packaging process is about 80% and vacuum degradation was not observed after 1000 h had passed. The developed vacuum packaging process is also applied to resonant accelerometers which need a high vacuum environment to implement higher performance.

  6. Research News: Are VLSI Microcircuits Too Hard to Design?

    ERIC Educational Resources Information Center

    Robinson, Arthur L.

    1980-01-01

    This research news article on microelectronics discusses the scientific challenge the integrated circuit industry will have in the next decade, for designing the complicated microcircuits made possible by advancing miniaturization technology. (HM)

  7. Efficient data transmission from silicon wafer strip detectors

    SciTech Connect

    Cooke, B.J.; Lackner, K.S.; Palounek, A.P.T.; Sharp, D.H.; Winter, L.; Ziock, H.J.

    1991-12-31

    An architecture for on-wafer processing is proposed for central silicon-strip tracker systems as they are currently designed for high energy physics experiments at the SSC, and for heavy ion experiments at RHIC. The data compression achievable with on-wafer processing would make it possible to transmit all data generated to the outside of the detector system. A set of data which completely describes the state of the wafer for low occupancy events and which contains important statistical information for more complex events can be transmitted immediately. This information could be used in early trigger decisions. Additional data packages which complete the description of the state of the wafer vary in size and are sent through a second channel. By buffering this channel the required bandwidth can be kept far below the peak data rates which occur in rate but interesting events. 18 refs.

  8. Surface defects in GaAs wafer processes

    NASA Astrophysics Data System (ADS)

    Matsushita, H.; Ishida, M.; Kikawa, J.

    1990-06-01

    The causes of micro- and macro-irregularities observed on GaAs(100) polished wafers were investigated. From the results, the wafer processes were improved so that a high-quality surface was obtained without orange peel, haze, or pits. For 3-inch wafers the flatness was improved to less than 2 μm in TTV and the warp to less than 5 μm. Improvements in the wafer processes were: development of a better polishing solution, filtering of this solution with maintenance of the pad conditions, thereby eliminating scratches, annealing at high temperature to eliminate pits, advances in slicing and lapping to reduce warp, and three-stage double-sided polishing to eliminate dimples and to improve TTV.

  9. Particle-wafer interactions in semiaqueous silicon cleaning systems

    NASA Astrophysics Data System (ADS)

    Hupka, Lukasz

    During the semiconductor chip manufacturing process, a silicon wafer goes through a number of cycles in both hydrophilic and hydrophobic environments. As silicon chips become more sophisticated, the manufacturing process becomes more involved and new challenges are imposed by size reduction, increase in the aspect ratio and the formation of multilayer structures. Wafer cleaning processes emerge several times in one manufacturing cycle. By rule of thumb, it is necessary to remove wafer contamination by particles which are half of a feature size. This is an enormous challenge, keeping in mind that currently wafer structures are of nanometer size. The cleaning procedures which worked for the last 40 years are becoming ineffective and obsolete. The industry calls for more efficient cleaning procedures in terms of particle contamination removal, and at the same time less aggressive procedures to prevent damage/dissolution of the fragile and narrow wafer structures. Atomic Force Microscopy (AFM), besides being an imaging tool with nano resolution, proves to be an indispensable instrument to characterize interaction forces, lateral forces, and adhesion between micron and submicron contaminant particles and the wafer surfaces both in air and liquid. Using the AFM colloidal probe technique interaction forces were measured between a contaminant particle and a wafer surface. These measurements were done for the silica---silica hydrophilic system and for the silanated silica---silanated silica hydrophobic system. The influence of the nonaqueous component in semiconductor wafer cleaning solution on interaction forces was also investigated under both hydrophilic and hydrophobic conditions. In addition the effect of particle size on the interaction forces as well as particle removal rate under both conditions is addressed. While force/radius normalization of measured interaction forces works great for hydrophilic systems, it was found to significantly underestimate the influence

  10. Automated reticle inspection data analysis for wafer fabs

    NASA Astrophysics Data System (ADS)

    Summers, Derek; Chen, Gong; Reese, Bryan; Hutchinson, Trent; Liesching, Marcus; Ying, Hai; Dover, Russell

    2009-04-01

    To minimize potential wafer yield loss due to mask defects, most wafer fabs implement some form of reticle inspection system to monitor photomask quality in high-volume wafer manufacturing environments. Traditionally, experienced operators review reticle defects found by an inspection tool and then manually classify each defect as 'pass, warn, or fail' based on its size and location. However, in the event reticle defects are suspected of causing repeating wafer defects on a completed wafer, potential defects on all associated reticles must be manually searched on a layer-by-layer basis in an effort to identify the reticle responsible for the wafer yield loss. This 'problem reticle' search process is a very tedious and time-consuming task and may cause extended manufacturing line-down situations. Often times, Process Engineers and other team members need to manually investigate several reticle inspection reports to determine if yield loss can be tied to a specific layer. Because of the very nature of this detailed work, calculation errors may occur resulting in an incorrect root cause analysis effort. These delays waste valuable resources that could be spent working on other more productive activities. This paper examines an automated software solution for converting KLA-Tencor reticle inspection defect maps into a format compatible with KLA-Tencor's Klarity Defect(R) data analysis database. The objective is to use the graphical charting capabilities of Klarity Defect to reveal a clearer understanding of defect trends for individual reticle layers or entire mask sets. Automated analysis features include reticle defect count trend analysis and potentially stacking reticle defect maps for signature analysis against wafer inspection defect data. Other possible benefits include optimizing reticle inspection sample plans in an effort to support "lean manufacturing" initiatives for wafer fabs.

  11. Automated reticle inspection data analysis for wafer fabs

    NASA Astrophysics Data System (ADS)

    Summers, Derek; Chen, Gong; Reese, Bryan; Hutchinson, Trent; Liesching, Marcus; Ying, Hai; Dover, Russell

    2008-10-01

    To minimize potential wafer yield loss due to mask defects, most wafer fabs implement some form of reticle inspection system to monitor photomask quality in high-volume wafer manufacturing environments. Traditionally, experienced operators review reticle defects found by an inspection tool and then manually classify each defect as 'pass, warn, or fail' based on its size and location. However, in the event reticle defects are suspected of causing repeating wafer defects on a completed wafer, potential defects on all associated reticles must be manually searched on a layer-by-layer basis in an effort to identify the reticle responsible for the wafer yield loss. This 'problem reticle' search process is a very tedious and time-consuming task and may cause extended manufacturing line-down situations. Often times, Process Engineers and other team members need to manually investigate several reticle inspection reports to determine if yield loss can be tied to a specific layer. Because of the very nature of this detailed work, calculation errors may occur resulting in an incorrect root cause analysis effort. These delays waste valuable resources that could be spent working on other more productive activities. This paper examines an automated software solution for converting KLA-Tencor reticle inspection defect maps into a format compatible with KLA-Tencor's Klarity DefecTM data analysis database. The objective is to use the graphical charting capabilities of Klarity Defect to reveal a clearer understanding of defect trends for individual reticle layers or entire mask sets. Automated analysis features include reticle defect count trend analysis and potentially stacking reticle defect maps for signature analysis against wafer inspection defect data. Other possible benefits include optimizing reticle inspection sample plans in an effort to support "lean manufacturing" initiatives for wafer fabs.

  12. Automated reticle inspection data analysis for wafer fabs

    NASA Astrophysics Data System (ADS)

    Summers, Derek; Chen, Gong; Reese, Bryan; Hutchinson, Trent; Liesching, Marcus; Ying, Hai; Dover, Russell

    2009-03-01

    To minimize potential wafer yield loss due to mask defects, most wafer fabs implement some form of reticle inspection system to monitor photomask quality in high-volume wafer manufacturing environments. Traditionally, experienced operators review reticle defects found by an inspection tool and then manually classify each defect as 'pass, warn, or fail' based on its size and location. However, in the event reticle defects are suspected of causing repeating wafer defects on a completed wafer, potential defects on all associated reticles must be manually searched on a layer-by-layer basis in an effort to identify the reticle responsible for the wafer yield loss. This 'problem reticle' search process is a very tedious and time-consuming task and may cause extended manufacturing line-down situations. Often times, Process Engineers and other team members need to manually investigate several reticle inspection reports to determine if yield loss can be tied to a specific layer. Because of the very nature of this detailed work, calculation errors may occur resulting in an incorrect root cause analysis effort. These delays waste valuable resources that could be spent working on other more productive activities. This paper examines an automated software solution for converting KLA-Tencor reticle inspection defect maps into a format compatible with KLA-Tencor's Klarity DefectTM data analysis database. The objective is to use the graphical charting capabilities of Klarity Defect to reveal a clearer understanding of defect trends for individual reticle layers or entire mask sets. Automated analysis features include reticle defect count trend analysis and potentially stacking reticle defect maps for signature analysis against wafer inspection defect data. Other possible benefits include optimizing reticle inspection sample plans in an effort to support "lean manufacturing" initiatives for wafer fabs.

  13. Strategy optimization for mask rule check in wafer fab

    NASA Astrophysics Data System (ADS)

    Yang, Chuen Huei; Lin, Shaina; Lin, Roger; Wang, Alice; Lee, Rachel; Deng, Erwin

    2015-07-01

    Photolithography process is getting more and more sophisticated for wafer production following Moore's law. Therefore, for wafer fab, consolidated and close cooperation with mask house is a key to achieve silicon wafer success. However, generally speaking, it is not easy to preserve such partnership because many engineering efforts and frequent communication are indispensable. The inattentive connection is obvious in mask rule check (MRC). Mask houses will do their own MRC at job deck stage, but the checking is only for identification of mask process limitation including writing, etching, inspection, metrology, etc. No further checking in terms of wafer process concerned mask data errors will be implemented after data files of whole mask are composed in mask house. There are still many potential data errors even post-OPC verification has been done for main circuits. What mentioned here are the kinds of errors which will only occur as main circuits combined with frame and dummy patterns to form whole reticle. Therefore, strategy optimization is on-going in UMC to evaluate MRC especially for wafer fab concerned errors. The prerequisite is that no impact on mask delivery cycle time even adding this extra checking. A full-mask checking based on job deck in gds or oasis format is necessary in order to secure acceptable run time. Form of the summarized error report generated by this checking is also crucial because user friendly interface will shorten engineers' judgment time to release mask for writing. This paper will survey the key factors of MRC in wafer fab.

  14. Electrochemical method for defect delineation in silicon-on-insulator wafers

    DOEpatents

    Guilinger, Terry R.; Jones, Howland D. T.; Kelly, Michael J.; Medernach, John W.; Stevenson, Joel O.; Tsao, Sylvia S.

    1991-01-01

    An electrochemical method for defect delineation in thin-film SOI or SOS wafers in which a surface of a silicon wafer is electrically connected so as to control the voltage of the surface within a specified range, the silicon wafer is then contacted with an electrolyte, and, after removing the electrolyte, defects and metal contamination in the silicon wafer are identified.

  15. A novel low-voltage low-power analogue VLSI implementation of neural networks with on-chip back-propagation learning

    NASA Astrophysics Data System (ADS)

    Carrasco, Manuel; Garde, Andres; Murillo, Pilar; Serrano, Luis

    2005-06-01

    In this paper a novel design and implementation of a VLSI Analogue Neural Net based on Multi-Layer Perceptron (MLP) with on-chip Back Propagation (BP) learning algorithm suitable for the resolution of classification problems is described. In order to implement a general and programmable analogue architecture, the design has been carried out in a hierarchical way. In this way the net has been divided in synapsis-blocks and neuron-blocks providing an easy method for the analysis. These blocks basically consist on simple cells, which are mainly, the activation functions (NAF), derivatives (DNAF), multipliers and weight update circuits. The analogue design is based on current-mode translinear techniques using MOS transistors working in the weak inversion region in order to reduce both the voltage supply and the power consumption. Moreover, with the purpose of minimizing the noise, offset and distortion of even order, the topologies are fully-differential and balanced. The circuit, named ANNE (Analogue Neural NEt), has been prototyped and characterized as a proof of concept on CMOS AMI-0.5A technology occupying a total area of 2.7mm2. The chip includes two versions of neural nets with on-chip BP learning algorithm, which are respectively a 2-1 and a 2-2-1 implementations. The proposed nets have been experimentally tested using supply voltages from 2.5V to 1.8V, which is suitable for single cell lithium-ion battery supply applications. Experimental results of both implementations included in ANNE exhibit a good performance on solving classification problems. These results have been compared with other proposed Analogue VLSI implementations of Neural Nets published in the literature demonstrating that our proposal is very efficient in terms of occupied area and power consumption.

  16. A wafer-level vacuum package using glass-reflowed silicon through-wafer interconnection for nano/micro devices.

    PubMed

    Jin, Joo-Young; Yoo, Seung-Hyun; Yoo, Byung-Wook; Kim, Yong-Kweon

    2012-07-01

    We propose a vacuum wafer-level packaging (WLP) process using glass-reflowed silicon via for nano/micro devices (NMDs). A through-wafer interconnection (TWIn) substrate with silicon vias and reflowed glass is introduced to accomplish a vertical feed-through of device. NMDs are fabricated in the single crystal silicon (SCS) layer which is formed on the TWIn substrate by Au eutectic bonding including Cr adhesion layer. The WLPof the devices is achieved with the capping glass wafer anodically bonded to the SCS layer. In order to demonstrate the successful hermetic packaging, we fabricated the micro-Pirani gauge in the SCS layer, and packaged it in the wafer-level. The vacuum level inside the packaging was measured to be 3.1 Torr with +/- 0.12 Torr uncertainty, and the packaging leakage was not detected during 24 hour after the packaging. PMID:22966554

  17. Use of nanoporous columnar thin film in the wafer-level packaging of MEMS devices

    NASA Astrophysics Data System (ADS)

    Lee, Byung-Kee; Choi, Dong-Hoon; Yoon, Jun-Bo

    2010-04-01

    This paper presents a new packaging technology that uses a nanoporous columnar thin film to seal microelectromechanical system (MEMS) devices at the wafer level. In the proposed packaging process, the processing temperature is 350 °C. The process is relatively inexpensive compared to wafer level packaging processes, because the wafer-bonding step is eliminated and the die size is shrunk. In the suggested approach, a sputtered columnar thin film at room temperature forms vertical nanopores as etch holes, and an air cavity is formed by the removal of a sacrificial layer through the nanopores in the columnar membrane. Subsequent hermetic vacuum packaging of the cavity is achieved by depositing thin films over the membrane under low pressure. The hermeticity of the packaging was verified by using an optical surface morphology microscope to measure the deflection change of the sealing membrane before and after breaking of the vacuum through an interconnected membrane. The long-term hermeticity was monitored by measuring the maximum central deflection of the PECVD sealing layer over a period of 170 days. The precise pressure (0.7 Torr) and short-term (30 days) pressure change inside the cavity were measured by encapsulated Ni Pirani gauges, representing packaged freestanding MEMS devices.

  18. Atomically flattening of Si surface of silicon on insulator and isolation-patterned wafers

    NASA Astrophysics Data System (ADS)

    Goto, Tetsuya; Kuroda, Rihito; Akagawa, Naoya; Suwa, Tomoyuki; Teramoto, Akinobu; Li, Xiang; Obara, Toshiki; Kimoto, Daiki; Sugawa, Shigetoshi; Ohmi, Tadahiro; Kamata, Yutaka; Kumagai, Yuki; Shibusawa, Katsuhiko

    2015-04-01

    By introducing high-purity and low-temperature Ar annealing at 850 °C, atomically flat Si surfaces of silicon-on-insulator (SOI) and shallow-trench-isolation (STI)-patterned wafers were obtained. In the case of the STI-patterned wafer, this low-temperature annealing and subsequent radical oxidation to form a gate oxide film were introduced into the complementary metal oxide semiconductor (CMOS) process with 0.22 µm technology. As a result, a test array circuit for evaluating the electrical characteristics of a very large number (>260,000) of metal oxide semiconductor field effect transistors (MOSFETs) having an atomically flat gate insulator/Si interface was successfully fabricated on a 200-mm-diameter wafer. By evaluating 262,144 nMOSFETs, it was found that not only the gate oxide reliability was improved, but also the noise amplitude of the gate-source voltage related to the random telegraph noise (RTN) was reduced owing to the introduction of the atomically flat gate insulator/Si interface.

  19. Innovative through-silicon-via formation approach for wafer-level packaging applications

    NASA Astrophysics Data System (ADS)

    Tang, Chao Wei; Tsu Young, Hong; Li, Kuan Ming

    2012-04-01

    Through-silicon via (TSV) is an emerging technology for three-dimensional integrated circuit, system-in-packaging and wafer-level packaging applications. Among several available TSV formation methods, Bosch deep reactive ion etching (DRIE) is widely used because it enables the fabrication of TSVs with almost any diameter, from the submicrometer level to hundreds of micrometers. However, the high cost of Bosch DRIE makes it uneconomical for industrial production. We present a novel wafer-level TSV formation approach that is effective and cost-efficient. The proposed method integrates a diode-pumped solid-state ultraviolet nanosecond pulsed laser and rapid wet chemical etching. The former is effective in drilling through 400 µm thick silicon wafers and the latter is used for removing the unwanted heat-affected zone, recast layer and debris left after drilling. Experimental results demonstrate that the combined approach effectively eliminates the unwanted material formed by nanosecond laser pulses. Furthermore, this approach has a significant cost advantage over Bosch DRIE. In summary, the proposed approach affords superior TSV quality, higher TSV throughput and lower cost of process ownership than Bosch DRIE. These advantages could provide the necessary impetus for rapid commercialization of the several high-density fabrication methodologies that depend on TSVs.

  20. Imprinted laminate wafer-level packaging for SAW ID-tags and SAW delay line sensors.

    PubMed

    Kuypers, Jan H; Tanaka, Shuji; Esashi, Masayoshi

    2011-02-01

    We have developed a wafer-level packaging solution for surface acoustic wave devices using imprinted dry film resist (DFR). The packaging process involves the preparation of an imprinted dry film resist that is aligned and laminated to the device wafer and requires one additional lithography step to define the package outline. Two commercial dry film solutions, SU-8 and TMMF, have been evaluated. Compared with traditional ceramic packages, no detectable RF parasitics are introduced by this packaging process. At the same time, the miniature package dimensions allow for wafer-level probing. The packaging process has the great advantage that the cavity formation does not require any sacrificial layer and no liquids, and therefore prevents contamination or stiction of the packaged device. This non-hermetic packaging process is ideal for passive antenna modules using polymer technology for low-cost SAW identification (ID)-tags or lidding in low-temperature cofired ceramic (LTCC) antenna substrates for high-performance wireless sensors. This technique is also applicable to SAW filters and duplexers for module integration in cellular phones using flip-chip mounting and hermetic overcoating. PMID:21342826

  1. 1.5-μm optical up-conversion: wafer fusion and related issues

    NASA Astrophysics Data System (ADS)

    Ban, Dayan; Luo, Hui; Liu, Hui-Chun; SpringThorpe, Anthony J.; Wasilewski, Zbigniew R.; Bezinger, Andrew; Bogdanov, Alexei; Buchanan, Margaret

    2004-11-01

    Imaging devices working in the near infrared (NIR), especially in the so-called eye-safe range, i.e., around 1.5 mm, have become increasingly important in many military and commercial applications; these include night vision, covert surveillance, range finding and semiconductor wafer inspection. We proposed a new approach in which a wafer-fused optical up-converter, combined with a commercially available charged coupled device (CCD), functions as an infrared camera. The optical up-converter converts incoming infrared light into shorter wavelength radiation that can be efficiently detected by the silicon CCD (cutoff wavelength about 1 mm). An optical up-converter with high efficiency at room-temperature is critical for low cost and large-area infrared imaging applications. A prototype 1.5 mm optical up-converter based on wafer fusion technology has been successfully fabricated. The device consists of an InGaAs/InP pin photodetector and a GaAs/AlGaAs light emitting diode. Experimental results show that the end-to-end up-conversion efficiency is 0.0177 W/W at room-temperature, corresponding to an internal quantum up-conversion efficiency of 76%. In this paper, the design, fabrications and characterization of the optical up-conversion devices is presented. Issues related to device optimization, such as improving internal and external up-conversion efficiency, are addressed. Preliminary results demonstrate the room-temperature up-conversion imaging operation of a pixelated wafer-fused device.

  2. Fabrication of a mechanically aligned single-wafer MEMS turbine with turbocharger

    NASA Astrophysics Data System (ADS)

    Pelekies, S. O.; Schuhmann, T.; Gardner, W. G.; Camacho, A.; Protz, J. M.

    2010-10-01

    We describe the fabrication of a turbocharged, microelectromechanical system (MEMS) turbine. The turbine will be part of a standalone power unit and includes extra layers to connect the turbine to a generator. The project goal is to demonstrate the successful combination of several features, namely: silicon fusion bonding (SFB), a micro turbocharger [2], two rotors, mechanical alignment between two wafers [1], and the use of only one 5" silicon wafer. The dimension of the actual turbine casing will be 14mm. The turbine rotor will have a diameter of 8mm. Given these dimensions, MEMS processes are an adequate way to fabricate the device, but it will be necessary to stack up seven different layers to build the turbine, as it is not possible to construct it out of one thick wafer. SFB will be used for bonding because it permits the great precision necessary for high quality alignment. Yet a more precise alignment will be necessary between the layers that contain the turbine rotor, to decrease imbalance and guarantee operation at a very high rpm. To achieve these tight tolerances, a mechanical alignment feature announced by Liudi Jiang [1] is used. The alignment accuracy is expected to be around 200nm. Despite the fact that the turbine consists of multiple layers, it will be fabricated on only one silicon-on-insulator (SOI) wafer. As a result, all layers are exposed to the same process flow. The fabrication process includes MEMS technology as photolithography, nine deep reactive ion etching (DRIE) steps, and six SFB operations. A total of 14 masks are necessary for the fabrication.

  3. Mapping stresses in high aspect ratio polysilicon electrical through-wafer interconnects

    NASA Astrophysics Data System (ADS)

    Sharma, Himani; Krabbe, Joshua D.; Farsinezhad, Samira; van Popta, Andy C.; Wakefield, Nick G.; Fitzpatrick, Glen A.; Shankar, Karthik

    2015-04-01

    Electrical through-wafer interconnect technologies such as vertical through-silicon vias (TSVs) are essential in order to maximize performance, optimize usage of wafer real estate, and enable three-dimensional packaging in leading edge electronic and microelectromechanical systems (MEMS) products. Although copper TSVs have the advantage of low resistance, highly doped polysilicon TSVs offer designers a much larger range of processing options due to the compatibility of polysilicon with high temperatures and also with the full range of traditional CMOS processes. Large stresses are associated with both Cu and polysilicon TSVs, and their accurate measurement is critical for determining the keep-out zone (KOZ) of transistors and for optimizing downstream processes to maintain high yield. This report presents the fabrication and stress characterization of 400-μm deep, 20-Ω resistance, high aspect ratio (25:1) polysilicon TSVs fabricated by deep reactive ion etching (DRIE) followed by low-pressure chemical vapor deposition (LPCVD) of polysilicon with in-situ boron doping. Micro-Raman imaging of the wafer surface showed a maximum stress of 1.2 GPa occurring at the TSV edge and a KOZ of ˜9 to 11 μm. For polysilicon TSVs, the stress distribution in the TSVs far from the wafer surface(s) was not previously well-understood due to measurement limitations. Raman spectroscopy was able to overcome this limitation; a TSV cross section was examined and stresses as a function of both depth and width of the TSVs were collected and are analyzed herein. An 1100°C postanneal was found to reduce average stresses by 40%.

  4. Improving on-wafer CD correlation analysis using advanced diagnostics and across-wafer light-source monitoring

    NASA Astrophysics Data System (ADS)

    Alagna, Paolo; Zurita, Omar; Rechtsteiner, Gregory; Lalovic, Ivan; Bekaert, Joost

    2014-04-01

    With the implementation of multi-patterning ArF-immersion for sub 20nm integrated circuits (IC), advances in equipment monitoring and control are needed to support on-wafer yield performance. These in-situ equipment monitoring improvements, along with advanced litho-cell corrections based on on-wafer measurements, enable meeting stringent overlay and CD control requirements for advanced lithography patterning. The importance of light-source performance on lithography pattering (CD and overlay) has been discussed in previous publications.[1-3] Recent developments of Cymer ArF light-source metrology and on-board monitoring enable end-users to detect, for each exposed wafer, changes in the near-field and far-field spatial profiles and polarization performance, [4-6] in addition to the key `optical' scalar parameters, such as bandwidth, wavelength and energy. The major advantage of this capability is that the key performance metrics are sampled at rates matched to wafer performance, e.g. every exposure field across the wafer, which is critical for direct correlation with on-wafer performance for process control and excursion detection.

  5. Techniques for Computing the DFT Using the Residue Fermat Number Systems and VLSI

    NASA Technical Reports Server (NTRS)

    Truong, T. K.; Chang, J. J.; Hsu, I. S.; Pei, D. Y.; Reed, I. S.

    1985-01-01

    The integer complex multiplier and adder over the direct sum of two copies of a finite field is specialized to the direct sum of the rings of integers modulo Fermat numbers. Such multiplications and additions can be used in the implementation of a discrete Fourier transform (DFT) of a sequence of complex numbers. The advantage of the present approach is that the number of multiplications needed for the DFT can be reduced substantially over the previous approach. The architectural designs using this approach are regular, simple, expandable and, therefore, naturally suitable for VLSI implementation.

  6. Application of error correcting codes in fault-tolerant logic design for VLSI circuits

    NASA Astrophysics Data System (ADS)

    Lala, P. K.; Martin, H. L.

    1990-05-01

    It is now generally accepted that not all faults in VLSI logic can be represented by the stuck-at-0 and stuck-at-1 models used at the gate level. In order to ensure realistic modeling, faults should be considered at the transistor level, since only at the level the complete circuit structure is known. In other words, test for circuits should be derived based on possible shorts and opens at the transistor level. A stuck-open or stuck-closed transistor can be modeled by replacing the faulty transistor with an open connection or a direct short respectively between the transistor's source and drain.

  7. Fault tolerant VLSI (Very Large-Scale Integration) design using error correcting codes

    NASA Astrophysics Data System (ADS)

    Hartmann, C. R.; Lala, P. K.; Ali, A. M.; Ganguly, S.; Visweswaran, G. S.

    1989-02-01

    Very Large-Scale Integration (VLSI) provides the opportunity to design fault tolerant, self-checking circuits with on-chip, concurrent error correction. This study determines the applicability of a variety of error-detecting, error-correcting codes (EDAC) in high speed digital data processors and buses. In considering both microcircuit faults and bus faults, some of the codes examined are: Berger, repetition, parity, residue, and Modified Reflected Binary codes. The report describes the improvement in fault tolerance obtained as a result of implementing these EDAC schemes and the associated penalties in circuit area.

  8. VLSI Implementation of a Bio-inspired Olfactory Spiking Neural Network

    NASA Astrophysics Data System (ADS)

    Hsieh, Hung-Yi; Tang, Kea-Tiong

    2011-11-01

    This paper proposes a VLSI circuit implementing a low power, high-resolution spiking neural network (SNN) with STDP synapses, inspired by mammalian olfactory systems. By representing mitral cell action potential by a step function, the power consumption and the chip area can be reduced. By cooperating sub-threshold oscillation and inhibition, the network outputs can be distinct. This circuit was fabricated using the TSMC 0.18 μm 1P6M CMOS process. Post-layout simulation results are reported.

  9. A VLSI pipeline design of a fast prime factor DFT on a finite field

    NASA Technical Reports Server (NTRS)

    Truong, T. K.; Hsu, I. S.; Shao, H. M.; Reed, I. S.; Shyu, H. C.

    1986-01-01

    A conventional prime factor discrete Fourier transform (DFT) algorithm is used to realize a discrete Fourier-like transform on the finite field, GF(q sub n). A pipeline structure is used to implement this prime factor DFT over GF(q sub n). This algorithm is developed to compute cyclic convolutions of complex numbers and to decode Reed-Solomon codes. Such a pipeline fast prime factor DFT algorithm over GF(q sub n) is regular, simple, expandable, and naturally suitable for VLSI implementation. An example illustrating the pipeline aspect of a 30-point transform over GF(q sub n) is presented.

  10. High-performance fault-tolerant VLSI systems using micro rollback

    NASA Technical Reports Server (NTRS)

    Tamir, Yuval; Tremblay, Marc

    1990-01-01

    A technique called micro rollback, which allows most of the performance penalty for concurrent error detection to be eliminated, is presented. Detection is performed in parallel with the transmission of information between modules, thus removing the delay for detection from the critical path. Erroneous information may thus reach its destination module several clock cycles before an error indication. Operations performed on this erroneous information are undone using a hardware mechanism for fast rollback of a few cycles. The implementation of a VLSI processor capable of micro rollback is discussed, as well as several critical issues related to its use in a complete system.

  11. Efficient VLSI parallel algorithm for Delaunay triangulation on orthogonal tree network in two and three dimensions

    SciTech Connect

    Saena, S.; Bhatt, P.C.P.; Prasad, V.C. )

    1990-03-01

    In this paper, a parallel algorithm for two- and three-dimensional Delaunay triangulation on an orthogonal tree network is described. The worst case time complexity of this algorithm is O(log {sup 2} N) in two dimensions and O(m {sup 1/2} log N) in three dimensions with N input points and m as the number of tetrahedra in tiangulation. The AT {sup 2} VLSI complexity on Thompson's logarithmic delay model is O(N {sup 2} log {sup 6} N) in two dimensions and O(m {sup 2} N log {sup 4} N) in three dimensions.

  12. Ultra-high-throughput Production of III-V/Si Wafer for Electronic and Photonic Applications

    NASA Astrophysics Data System (ADS)

    Geum, Dae-Myeong; Park, Min-Su; Lim, Ju Young; Yang, Hyun-Duk; Song, Jin Dong; Kim, Chang Zoo; Yoon, Euijoon; Kim, Sanghyeon; Choi, Won Jun

    2016-02-01

    Si-based integrated circuits have been intensively developed over the past several decades through ultimate device scaling. However, the Si technology has reached the physical limitations of the scaling. These limitations have fuelled the search for alternative active materials (for transistors) and the introduction of optical interconnects (called “Si photonics”). A series of attempts to circumvent the Si technology limits are based on the use of III-V compound semiconductor due to their superior benefits, such as high electron mobility and direct bandgap. To use their physical properties on a Si platform, the formation of high-quality III-V films on the Si (III-V/Si) is the basic technology ; however, implementing this technology using a high-throughput process is not easy. Here, we report new concepts for an ultra-high-throughput heterogeneous integration of high-quality III-V films on the Si using the wafer bonding and epitaxial lift off (ELO) technique. We describe the ultra-fast ELO and also the re-use of the III-V donor wafer after III-V/Si formation. These approaches provide an ultra-high-throughput fabrication of III-V/Si substrates with a high-quality film, which leads to a dramatic cost reduction. As proof-of-concept devices, this paper demonstrates GaAs-based high electron mobility transistors (HEMTs), solar cells, and hetero-junction phototransistors on Si substrates.

  13. Ultra-high-throughput Production of III-V/Si Wafer for Electronic and Photonic Applications

    PubMed Central

    Geum, Dae-Myeong; Park, Min-Su; Lim, Ju Young; Yang, Hyun-Duk; Song, Jin Dong; Kim, Chang Zoo; Yoon, Euijoon; Kim, SangHyeon; Choi, Won Jun

    2016-01-01

    Si-based integrated circuits have been intensively developed over the past several decades through ultimate device scaling. However, the Si technology has reached the physical limitations of the scaling. These limitations have fuelled the search for alternative active materials (for transistors) and the introduction of optical interconnects (called “Si photonics”). A series of attempts to circumvent the Si technology limits are based on the use of III-V compound semiconductor due to their superior benefits, such as high electron mobility and direct bandgap. To use their physical properties on a Si platform, the formation of high-quality III-V films on the Si (III-V/Si) is the basic technology ; however, implementing this technology using a high-throughput process is not easy. Here, we report new concepts for an ultra-high-throughput heterogeneous integration of high-quality III-V films on the Si using the wafer bonding and epitaxial lift off (ELO) technique. We describe the ultra-fast ELO and also the re-use of the III-V donor wafer after III-V/Si formation. These approaches provide an ultra-high-throughput fabrication of III-V/Si substrates with a high-quality film, which leads to a dramatic cost reduction. As proof-of-concept devices, this paper demonstrates GaAs-based high electron mobility transistors (HEMTs), solar cells, and hetero-junction phototransistors on Si substrates. PMID:26864968

  14. Ultra-high-throughput Production of III-V/Si Wafer for Electronic and Photonic Applications.

    PubMed

    Geum, Dae-Myeong; Park, Min-Su; Lim, Ju Young; Yang, Hyun-Duk; Song, Jin Dong; Kim, Chang Zoo; Yoon, Euijoon; Kim, SangHyeon; Choi, Won Jun

    2016-01-01

    Si-based integrated circuits have been intensively developed over the past several decades through ultimate device scaling. However, the Si technology has reached the physical limitations of the scaling. These limitations have fuelled the search for alternative active materials (for transistors) and the introduction of optical interconnects (called "Si photonics"). A series of attempts to circumvent the Si technology limits are based on the use of III-V compound semiconductor due to their superior benefits, such as high electron mobility and direct bandgap. To use their physical properties on a Si platform, the formation of high-quality III-V films on the Si (III-V/Si) is the basic technology ; however, implementing this technology using a high-throughput process is not easy. Here, we report new concepts for an ultra-high-throughput heterogeneous integration of high-quality III-V films on the Si using the wafer bonding and epitaxial lift off (ELO) technique. We describe the ultra-fast ELO and also the re-use of the III-V donor wafer after III-V/Si formation. These approaches provide an ultra-high-throughput fabrication of III-V/Si substrates with a high-quality film, which leads to a dramatic cost reduction. As proof-of-concept devices, this paper demonstrates GaAs-based high electron mobility transistors (HEMTs), solar cells, and hetero-junction phototransistors on Si substrates. PMID:26864968

  15. Very large scale heterogeneous integration (VLSHI) and wafer-level vacuum packaging for infrared bolometer focal plane arrays

    NASA Astrophysics Data System (ADS)

    Forsberg, Fredrik; Roxhed, Niclas; Fischer, Andreas C.; Samel, Björn; Ericsson, Per; Hoivik, Nils; Lapadatu, Adriana; Bring, Martin; Kittilsland, Gjermund; Stemme, Göran; Niklaus, Frank

    2013-09-01

    Imaging in the long wavelength infrared (LWIR) range from 8 to 14 μm is an extremely useful tool for non-contact measurement and imaging of temperature in many industrial, automotive and security applications. However, the cost of the infrared (IR) imaging components has to be significantly reduced to make IR imaging a viable technology for many cost-sensitive applications. This paper demonstrates new and improved fabrication and packaging technologies for next-generation IR imaging detectors based on uncooled IR bolometer focal plane arrays. The proposed technologies include very large scale heterogeneous integration for combining high-performance, SiGe quantum-well bolometers with electronic integrated read-out circuits and CMOS compatible wafer-level vacuum packing. The fabrication and characterization of bolometers with a pitch of 25 μm × 25 μm that are arranged on read-out-wafers in arrays with 320 × 240 pixels are presented. The bolometers contain a multi-layer quantum well SiGe thermistor with a temperature coefficient of resistance of -3.0%/K. The proposed CMOS compatible wafer-level vacuum packaging technology uses Cu-Sn solid-liquid interdiffusion (SLID) bonding. The presented technologies are suitable for implementation in cost-efficient fabless business models with the potential to bring about the cost reduction needed to enable low-cost IR imaging products for industrial, security and automotive applications.

  16. Low-temperature titanium-based wafer bonding

    NASA Astrophysics Data System (ADS)

    Yu, Jian

    This thesis presents novel methods of metal-based wafer bonding at back-end-of-the-line (BEOL) compatible conditions (≤450°C). For the first time to our knowledge, 200 mm diameter oxidized Si wafers are bonded with prime Si wafers using 10-300 nm thick Ti as bonding intermediate at 300-450°C. Nearly void-free bonding with strong mechanical integrity has been confirmed. Moreover, microcavity formation has been demonstrated by bonding of patterned wafers. Both Rutherford backscattering spectroscopy (RBS) and Auger electron spectroscopy (AES) show clear evidence of Si and Ti interdiffusion, whereas high-resolution transmission electron microscopy (HRTEM) reveals an approximately 8 nm thick amorphous layer at the bonding interface. Those results indicate that the strong adhesion at the Ti/Si bonding interface is attributed to a solid-state amorphization (SSA) assisted by interdiffusion. A key effort is devoted to fundamental investigation of low-temperature transition metal(TM)/Si-based wafer bonding. With the extensive work on Ti/Si system, additional experiments are performed with six other TM/Si systems, namely Ni/Si, Co/Si, Pd/Si, Hf/Si, Au/Si and Ta/Si. The results indicate there are two principal requirements for TM/Si-based wafer bonding: (1) intimate contact (able to break through kinetic barriers), and (2) adequate chemical bonding. Three kinetic barriers addressed in this thesis are: (1) enclosed microvoids due to surface roughness, (2) gas molecules at the bonding interface, and (3) interfacial oxides. Presence of these barriers can prevent formation of intimate contact, consequently retarding or even blocking interfacial interactions for chemical bonding. The unique properties of Group IVA metals (e.g., Ti and Hf) to reduce native SiO2 on Si surfaces and their exceptionally large solid solubility for O2 and N2, help overcome those issues. Once kinetic barriers are surmounted, the key for strong metal/Si-based wafer bonding is formation of chemical bonds

  17. Investigation of the Relationship between Whole-Wafer Strength and Control of Its Edge Engineering

    NASA Astrophysics Data System (ADS)

    Chen, Po-Ying; Tsai, Ming-Hsing; Yeh, Wen-Kuan; Jing, Ming-Haw; Chang, Yukon

    2009-12-01

    Silicon wafer breakage has become a major concern for all semiconductor fabrication lines because it is brittle, and thus high stresses are easily induced in its manufacture. The production cost of devices significantly increases even for a breakage loss of a few percent if wafers are broken near completion. Even wafer breakage near the beginning of the process is significant. In this investigation, we develop a brand new approach to reducing breakage by using a charge-coupled device (CCD) to capture the cross-section image of the wafer at its edge; the data measured at the edge can be used to determine overall wafer strength. Analysis of the image of the wafer edge is used to characterize silicon strength, and a simple drop test is conducted to elucidate wafer failure, improving our understanding of the accumulation of stress in the wafer bulk before failure. We also describe many of the improvements that have resulted in the virtual elimination of wafer breakage due to unidentified causes. Our analysis gives the optimal front size (B1), edge widths (A1,A2), and bevel angle (θ) for the edge profiles of wafers to prevent wafer breakage. Briefly, when a suitable material and suitable process control approaches are utilized, silicon wafer breakage can be prevented. This is the first investigation providing evidence that whole-wafer strength is an important issue. We present a physical model to explain why wafer fracture has become an increasingly serious problem as the diameter of wafers has increased. The control of wafer edge geometry has been demonstrated to be an effective means of protecting wafers with large diameters against breakage. This model reveals that the breakage rate of wafers can be reduced by controlling the uniformity of the differences between the front size and the rear edge widths during the wafer manufacturing process.

  18. Flat-plate solar array project. Volume 3: Silicon sheet: Wafers and ribbons

    NASA Technical Reports Server (NTRS)

    Briglio, A.; Dumas, K.; Leipold, M.; Morrison, A.

    1986-01-01

    The primary objective of the Silicon Sheet Task of the Flat-Plate Solar Array (FSA) Project was the development of one or more low cost technologies for producing silicon sheet suitable for processing into cost-competitive solar cells. Silicon sheet refers to high purity crystalline silicon of size and thickness for fabrication into solar cells. Areas covered in the project were ingot growth and casting, wafering, ribbon growth, and other sheet technologies. The task made and fostered significant improvements in silicon sheet including processing of both ingot and ribbon technologies. An additional important outcome was the vastly improved understanding of the characteristics associated with high quality sheet, and the control of the parameters required for higher efficiency solar cells. Although significant sheet cost reductions were made, the technology advancements required to meet the task cost goals were not achieved.

  19. Measuring Radiation Patterns of Reconfigurable Patch Antennas on Wafers

    NASA Technical Reports Server (NTRS)

    Simons, Rainee N.

    2004-01-01

    An apparatus and technique have been devised for measuring the radiation pattern of a microwave patch antenna that is one of a number of identical units that have been fabricated in a planar array on a high-resistivity silicon wafer. The apparatus and technique are intended, more specifically, for application to such an antenna that includes a DC-controlled microelectromechanical system (MEMS) actuator for switching the antenna between two polarization states or between two resonance frequencies. Prior to the development of the present apparatus and technique, patch antennas on wafers were tested by techniques and equipment that are more suited to testing of conventional printed-circuit antennas. The techniques included sawing of the wafers to isolate individual antennas for testing. The equipment included custom-built test fixtures that included special signal launchers and transmission-line transitions. The present apparatus and technique eliminate the need for sawing wafers and for custom-built test fixtures, thereby making it possible to test antennas in less time and at less cost. Moreover, in a production setting, elimination of the premature sawing of wafers for testing reduces loss from breakage, thereby enhancing yield.

  20. Simple and accurate optical height sensor for wafer inspection systems

    NASA Astrophysics Data System (ADS)

    Shimura, Kei; Nakai, Naoya; Taniguchi, Koichi; Itoh, Masahide

    2016-02-01

    An accurate method for measuring the wafer surface height is required for wafer inspection systems to adjust the focus of inspection optics quickly and precisely. A method for projecting a laser spot onto the wafer surface obliquely and for detecting its image displacement using a one-dimensional position-sensitive detector is known, and a variety of methods have been proposed for improving the accuracy by compensating the measurement error due to the surface patterns. We have developed a simple and accurate method in which an image of a reticle with eight slits is projected on the wafer surface and its reflected image is detected using an image sensor. The surface height is calculated by averaging the coordinates of the images of the slits in both the two directions in the captured image. Pattern-related measurement error was reduced by applying the coordinates averaging to the multiple-slit-projection method. Accuracy of better than 0.35 μm was achieved for a patterned wafer at the reference height and ±0.1 mm from the reference height in a simple configuration.

  1. Quantitative phase measurement for wafer-level optics

    NASA Astrophysics Data System (ADS)

    Qu, Weijuan; Wen, Yongfu; Wang, Zhaomin; Yang, Fang; Huang, Lei; Zuo, Chao

    2015-07-01

    Wafer-level-optics now is widely used in smart phone camera, mobile video conferencing or in medical equipment that require tiny cameras. Extracting quantitative phase information has received increased interest in order to quantify the quality of manufactured wafer-level-optics, detect defective devices before packaging, and provide feedback for manufacturing process control, all at the wafer-level for high-throughput microfabrication. We demonstrate two phase imaging methods, digital holographic microscopy (DHM) and Transport-of-Intensity Equation (TIE) to measure the phase of the wafer-level lenses. DHM is a laser-based interferometric method based on interference of two wavefronts. It can perform a phase measurement in a single shot. While a minimum of two measurements of the spatial intensity of the optical wave in closely spaced planes perpendicular to the direction of propagation are needed to do the direct phase retrieval by solving a second-order differential equation, i.e., with a non-iterative deterministic algorithm from intensity measurements using the Transport-of-Intensity Equation (TIE). But TIE is a non-interferometric method, thus can be applied to partial-coherence light. We demonstrated the capability and disability for the two phase measurement methods for wafer-level optics inspection.

  2. VLSI Design of a Variable-Length FFT/IFFT Processor for OFDM-Based Communication Systems

    NASA Astrophysics Data System (ADS)

    Kuo, Jen-Chih; Wen, Ching-Hua; Lin, Chih-Hsiu; Wu, An-Yeu (Andy)

    2003-12-01

    The technique of orthogonal frequency division multiplexing (OFDM) is famous for its robustness against frequency-selective fading channel. This technique has been widely used in many wired and wireless communication systems. In general, the fast Fourier transform (FFT) and inverse FFT (IFFT) operations are used as the modulation/demodulation kernel in the OFDM systems, and the sizes of FFT/IFFT operations are varied in different applications of OFDM systems. In this paper, we design and implement a variable-length prototype FFT/IFFT processor to cover different specifications of OFDM applications. The cached-memory FFT architecture is our suggested VLSI system architecture to design the prototype FFT/IFFT processor for the consideration of low-power consumption. We also implement the twiddle factor butterfly processing element (PE) based on the coordinate rotation digital computer (CORDIC) algorithm, which avoids the use of conventional multiplication-and-accumulation unit, but evaluates the trigonometric functions using only add-and-shift operations. Finally, we implement a variable-length prototype FFT/IFFT processor with TSMC[InlineEquation not available: see fulltext.]m 1P4M CMOS technology. The simulations results show that the chip can perform ([InlineEquation not available: see fulltext.]-[InlineEquation not available: see fulltext.])-point FFT/IFFT operations up to[InlineEquation not available: see fulltext.] operating frequency which can meet the speed requirement of most OFDM standards such as WLAN, ADSL, VDSL ([InlineEquation not available: see fulltext.]), DAB, and[InlineEquation not available: see fulltext.]-mode DVB.

  3. Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool

    SciTech Connect

    Wronosky, J.B.; Smith, T.G.; Darnold, J.R.

    1995-12-01

    A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

  4. Development of a Wafer Positioning System for the Sandia Extreme Ultraviolet Lithography Tool

    NASA Technical Reports Server (NTRS)

    Wronosky, John B.; Smith, Tony G.; Darnold, Joel R.

    1996-01-01

    A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

  5. 100% foundry compatible packaging and full wafer release and die separation technique for surface micromachined devices

    SciTech Connect

    OLIVER,ANDREW D.; MATZKE,CAROLYN M.

    2000-04-06

    A completely foundry compatible chip-scale package for surface micromachines has been successfully demonstrated. A pyrex (Corning 7740) glass cover is placed over the released surface micromachined die and anodically bonded to a planarized polysilicon bonding ring. Electrical feedthroughs for the surface micromachine pass underneath the polysilicon sealing ring. The package has been found to be hermetic with a leak rate of less than 5 x 10{sup {minus}8} atm cm{sup {minus}3}/s. This technology has applications in the areas of hermetic encapsulation and wafer level release and die separation.

  6. Parallel algorithms for placement and routing in VLSI design. Ph.D. Thesis

    NASA Technical Reports Server (NTRS)

    Brouwer, Randall Jay

    1991-01-01

    The computational requirements for high quality synthesis, analysis, and verification of very large scale integration (VLSI) designs have rapidly increased with the fast growing complexity of these designs. Research in the past has focused on the development of heuristic algorithms, special purpose hardware accelerators, or parallel algorithms for the numerous design tasks to decrease the time required for solution. Two new parallel algorithms are proposed for two VLSI synthesis tasks, standard cell placement and global routing. The first algorithm, a parallel algorithm for global routing, uses hierarchical techniques to decompose the routing problem into independent routing subproblems that are solved in parallel. Results are then presented which compare the routing quality to the results of other published global routers and which evaluate the speedups attained. The second algorithm, a parallel algorithm for cell placement and global routing, hierarchically integrates a quadrisection placement algorithm, a bisection placement algorithm, and the previous global routing algorithm. Unique partitioning techniques are used to decompose the various stages of the algorithm into independent tasks which can be evaluated in parallel. Finally, results are presented which evaluate the various algorithm alternatives and compare the algorithm performance to other placement programs. Measurements are presented on the parallel speedups available.

  7. New VLSI smart sensor for collision avoidance inspired by insect vision

    NASA Astrophysics Data System (ADS)

    Abbott, Derek; Moini, Alireza; Yakovleff, Andre; Nguyen, X. Thong; Blanksby, Andrew; Kim, Gyudong; Bouzerdoum, Abdesselam; Bogner, Robert E.; Eshraghian, Kamran

    1995-01-01

    An analog VLSI implementation of a smart microsensor that mimics the early visual processing stage in insects is described with an emphasis on the overall concept and the front- end detection. The system employs the `smart sensor' paradigm in that the detectors and processing circuitry are integrated on the one chip. The integrated circuit is composed of sixty channels of photodetectors and parallel processing elements. The photodetection circuitry includes p-well junction diodes on a 2 micrometers CMOS process and a logarithmic compression to increase the dynamic range of the system. The future possibility of gallium arsenide implementation is discussed. The processing elements behind each photodetector contain a low frequency differentiator where subthreshold design methods have been used. The completed IC is ideal for motion detection, particularly collision avoidance tasks, as it essentially detects distance, speed & bearing of an object. The Horridge Template Model for insect vision has been directly mapped into VLSI and therefore the IC truly exploits the beauty of nature in that the insect eye is so compact with parallel processing, enabling compact motion detection without the computational overhead of intensive imaging, full image extraction and interpretation. This world-first has exciting applications in the areas of automobile anti- collision, IVHS, autonomous robot guidance, aids for the blind, continuous process monitoring/web inspection and automated welding, for example.

  8. Sensor-based driving of a car with fuzzy inferencing VLSI chips and boards

    SciTech Connect

    Pin, F.G.; Watanabe, Y.

    1992-09-01

    This paper discusses the sensor-based driving of a car in a-priori unknown environments using ``human-like`` reasoning schemes. The schemes are implemented on custom-designed VLSI fuzzy inferencing boards and are used to investigate two control modes for driving a car on the basis of very sparse and imprecise range data. In the first mode, the car navigates fully autonomously, while in the second mode, the system acts as a driver`s aid providing the driver with linguistic (fuzzy) commands to turn left or right and speed up, slow down, stop, or back up depending on the obstacles perceived by the sensors. Experiments with both modes of control are described in which the system uses only three acoustic range (sonar) sensor channels to perceive the environment. Sample results are presented which illustrate the feasibility of developing autonomous navigation systems and robust safety enhancing driver`s aid using the new fuzzy inferencing VLSI hardware and ``human-like`` reasoning schemes.

  9. VLSI floorplan repair using dynamic white-space management, constraint graphs, and linear programming

    NASA Astrophysics Data System (ADS)

    Vorwerk, Kristoffer; Kennings, Andrew; Anjos, Miguel

    2008-06-01

    In VLSI layout, floorplanning refers to the task of placing macrocells on a chip without overlap while minimizing design objectives such as timing, congestion, and wire length. Experienced VLSI designers have traditionally been able to produce more efficient floorplans than automated methods. However, with the increasing complexity of modern circuits, manual design flows have become infeasible. An efficient top-down strategy for overlap removal which repairs overlaps in floorplans produced by placement algorithms or rough floorplanning methodologies is presented in this article. The algorithmic framework proposed incorporates a novel geometric shifting technique coupled with topological constraint graphs and linear programming within a top-down flow. The effectiveness of this framework is quantified across a broad range of floorplans produced by multiple tools. The method succeeds in producing valid placements in almost all cases; moreover, compared with leading methods, it requires only one-fifth of the run-time and produces placements with 4-13% less wire length and up to 43% less cell movement.

  10. Real-Time Classification of Complex Patterns Using Spike-Based Learning in Neuromorphic VLSI.

    PubMed

    Mitra, S; Fusi, S; Indiveri, G

    2009-02-01

    Real-time classification of patterns of spike trains is a difficult computational problem that both natural and artificial networks of spiking neurons are confronted with. The solution to this problem not only could contribute to understanding the fundamental mechanisms of computation used in the biological brain, but could also lead to efficient hardware implementations of a wide range of applications ranging from autonomous sensory-motor systems to brain-machine interfaces. Here we demonstrate real-time classification of complex patterns of mean firing rates, using a VLSI network of spiking neurons and dynamic synapses which implement a robust spike-driven plasticity mechanism. The learning rule implemented is a supervised one: a teacher signal provides the output neuron with an extra input spike-train during training, in parallel to the spike-trains that represent the input pattern. The teacher signal simply indicates if the neuron should respond to the input pattern with a high rate or with a low one. The learning mechanism modifies the synaptic weights only as long as the current generated by all the stimulated plastic synapses does not match the output desired by the teacher, as in the perceptron learning rule. We describe the implementation of this learning mechanism and present experimental data that demonstrate how the VLSI neural network can learn to classify patterns of neural activities, also in the case in which they are highly correlated. PMID:23853161

  11. Soft-error filtering: A solution to the reliability problem of future VLSI digital circuits

    SciTech Connect

    Savaria, Y.; Rumin, N.C.; Hayes, J.F.; Agarwal, V.

    1986-05-01

    As the semiconductor industry continues to scale down the feature sizes in VLSI digital circuits, soft errors will eventually limit the reliability of these circuits. An important source of these errors will be the products of radioactive decay. It is proposed to combat these transient errors by a new technique called soft-error filtering (SEF). This is based on filtering the input to every latch in the VLSI circuit, thereby preventing these transients, generated by alpha particle hits in the combinational section, from being latched in the corresponding registers. Several approaches to the problem of designing filtering latches are compared. This comparison demonstrates the superiority of a double-filter realization. The design for a CMOS implementation of the double-filter latch is presented. Not only is the design simple and efficient, but it can be expected to be tolerant to process variations. A comparison of SEF with conventional techniques for dealing with soft errors shows the former to be generally much more attractive, from the point of view of both area and time overhead.

  12. Coherent VLSI (Very Large Scale Integration) design environment. Semiannual technical report, April 1-September 30, 1985

    SciTech Connect

    Glasser, L.A.; Knight, T.F.; Leiserson, C.E.; Rivest, R.L.

    1985-09-30

    This report covers the period from April 1, 1985 through September 30, 1985. The research discussed here is described in more detail in several published and unpublished reports cited. The CAD frame Schema has progressed to the point where it is useful for ample chip designs. The interface to CIF is complete, and work has begun on importing layout libraries. An interface to EDIF is being installed. Simulators can now be connected, and thought is going into organization of VLSI libraries. A plan for the distribution of Schema is now being worked out. Members of the DARPA VLSI community will be able to get copies in the Fall of 1985 or Spring of 1986. Previous results on waveform bounding have been generalized to large classes of problems described in canonical control-theory form. Work has begun on models for interconnect taking account of line inductance. This domain is less general that RLC networks, and there is hope that some of the previously derived bounds still apply. Indeed, some such results are reported here. During this period a novel device, the UV write-enabled PROM, was reported at a conference. Work continues on developing useful circuits employing this device.

  13. VLSI circuits implementing computational models of neocortical circuits.

    PubMed

    Wijekoon, Jayawan H B; Dudek, Piotr

    2012-09-15

    This paper overviews the design and implementation of three neuromorphic integrated circuits developed for the COLAMN ("Novel Computing Architecture for Cognitive Systems based on the Laminar Microcircuitry of the Neocortex") project. The circuits are implemented in a standard 0.35 μm CMOS technology and include spiking and bursting neuron models, and synapses with short-term (facilitating/depressing) and long-term (STDP and dopamine-modulated STDP) dynamics. They enable execution of complex nonlinear models in accelerated-time, as compared with biology, and with low power consumption. The neural dynamics are implemented using analogue circuit techniques, with digital asynchronous event-based input and output. The circuits provide configurable hardware blocks that can be used to simulate a variety of neural networks. The paper presents experimental results obtained from the fabricated devices, and discusses the advantages and disadvantages of the analogue circuit approach to computational neural modelling. PMID:22342970

  14. Optical wafer metrology sensors for process-robust CD and overlay control in semiconductor device manufacturing

    NASA Astrophysics Data System (ADS)

    den Boef, Arie J.

    2016-06-01

    This paper presents three optical wafer metrology sensors that are used in lithography for robustly measuring the shape and position of wafers and device patterns on these wafers. The first two sensors are a level sensor and an alignment sensor that measure, respectively, a wafer height map and a wafer position before a new pattern is printed on the wafer. The third sensor is an optical scatterometer that measures critical dimension-variations and overlay after the resist has been exposed and developed. These sensors have different optical concepts but they share the same challenge that sub-nm precision is required at high throughput on a large variety of processed wafers and in the presence of unknown wafer processing variations. It is the purpose of this paper to explain these challenges in more detail and give an overview of the various solutions that have been introduced over the years to come to process-robust optical wafer metrology.

  15. A novel approach: high resolution inspection with wafer plane defect detection

    NASA Astrophysics Data System (ADS)

    Hess, Carl; Wihl, Mark; Shi, Rui-fang; Xiong, Yalin; Pang, Song

    2008-05-01

    High Resolution reticle inspection is well-established as a proven, effective, and efficient means of detecting yield-limiting mask defects as well as defects which are not immediately yield-limiting yet can enable manufacturing process improvements. Historically, RAPID products have enabled detection of both classes of these defects. The newly-developed Wafer Plane Inspection (WPI) detector technology meets the needs of some advanced mask manufacturers to identify the lithographically-significant defects while ignoring the other non-lithographically-significant defects. Wafer Plane Inspection accomplishes this goal by performing defect detection based on a modeled image of how the mask features would actually print in the photoresist. This has the effect of reducing sensitivity to non-printing defects while enabling higher sensitivity focused in high MEEF areas where small reticle defects still yield significant printing defects on wafers. WPI is a new inspection mode that has been developed by KLA-Tencor and is currently under test with multiple customers. It employs the same transmitted and reflected-light high-resolution images as the industry-standard high-resolution inspections, but with much more sophisticated processing involved. A rigorous mask pattern recovery algorithm is used to convert the transmitted and reflected light images into a modeled representation of the reticle. Lithographic modeling of the scanner is then used to generate an aerial image of the mask. This is followed by resist modeling to determine the exposure of the photoresist. The defect detectors are then applied on this photoresist plane so that only printing defects are detected. Note that no hardware modifications to the inspection system are required to enable this detector. The same tool will be able to perform both our standard High Resolution inspections and the Wafer Plane Inspection detector. This approach has several important features. The ability to ignore non

  16. A VLSI design for computing exponentiations in GF(2m) and its application to generate pseudorandom number sequences

    NASA Technical Reports Server (NTRS)

    Wang, Charles C.; Pei, Dingyi

    1990-01-01

    A VLSI design for computing exponentiation in finite fields is developed. An algorithm to generate a relatively long pseudorandom number sequence is presented. It is shown that the period of this sequence is significantly increased compared to that of the sequence generated by the most commonly used maximal length shift register scheme.

  17. Microwave Induced Direct Bonding of Single Crystal Silicon Wafers

    NASA Technical Reports Server (NTRS)

    Budraa, N. K.; Jackson, H. W.; Barmatz, M.

    1999-01-01

    We have heated polished doped single-crystal silicon wafers in a single mode microwave cavity to temperatures where surface to surface bonding occurred. The absorption of microwaves and heating of the wafers is attributed to the inclusion of n-type or p-type impurities into these substrates. A cylindrical cavity TM (sub 010) standing wave mode was used to irradiate samples of various geometry's at positions of high magnetic field. This process was conducted in vacuum to exclude plasma effects. This initial study suggests that the inclusion of impurities in single crystal silicon significantly improved its microwave absorption (loss factor) to a point where heating silicon wafers directly can be accomplished in minimal time. Bonding of these substrates, however, occurs only at points of intimate surface to surface contact. The inclusion of a thin metallic layer on the surfaces enhances the bonding process.

  18. Nano-particle laser removal from silicon wafers

    NASA Astrophysics Data System (ADS)

    Lee, J. M.; Cho, S. H.; Kim, T. H.; Park, Jin-Goo; Busnaina, Ahmed A.

    2003-11-01

    A laser shock cleaning (LSC) technique as a new dry cleaning methodology has been applied to remove micro and nano-scale inorganic particulate contaminants. Shock wave is generated in the air just above the wafer surface by focusing intensive laser beam. The velocity of shock wave can be controlled to 10,000 m/sec. The sub-micron sized silica and alumina particles are attempted to remove from bare silicon wafer surfaces. More than 95% of removal efficiency of the both particles are carried out by the laser-induced airborne shock waves. In the final, a removal of nano-scale slurry particles from real patterned wafers are successfully demonstrated by LSC after chemical-mechanical polishing (CMP) process.

  19. Silicon-wafer-surface damage revealed by surface photovoltage measurements

    NASA Astrophysics Data System (ADS)

    Goodman, Alvin M.

    1982-11-01

    Anomalous results of surface photovoltage (SPV) measurements on Si wafers are shown to be associated with a damaged region beneath the illuminated surface of the wafer being measured. The anomaly is a concave-upward curvature of the I0(α-1) plot with an r2 value, derived from linear regression analysis, less than the normally observed minimum value (˜0.98). Removal of the damaged region by an appropriate etching procedure allows subsequent SPV measurements whose results are substantially free of the previously observed anomaly. The qualitative character of the anomaly can be reproduced by a simple theoretical model in which only one effect of the damage is considered; this effect is a diminished quantum efficiency for hole-electron pair generation by photon absorption in the damaged region. The results suggest the use of SPV measurements as a test procedure for revealing the presence of surface damage in Si wafers.

  20. Silicon carbide wafer bonding by modified surface activated bonding method

    NASA Astrophysics Data System (ADS)

    Suga, Tadatomo; Mu, Fengwen; Fujino, Masahisa; Takahashi, Yoshikazu; Nakazawa, Haruo; Iguchi, Kenichi

    2015-03-01

    4H-SiC wafer bonding has been achieved by the modified surface activated bonding (SAB) method without any chemical-clean treatment and high temperature annealing. Strong bonding between the SiC wafers with tensile strength greater than 32 MPa was demonstrated at room temperature under 5 kN force for 300 s. Almost the entire wafer has been bonded very well except a small peripheral region and few voids. The interface structure was analyzed to verify the bonding mechanism. It was found an amorphous layer existed as an intermediate layer at the interface. After annealing at 1273 K in vacuum for 1 h, the bonding tensile strength was still higher than 32 MPa. The interface changes after annealing were also studied. The results show that the thickness of the amorphous layer was reduced to half after annealing.

  1. Influences of the exhaust flow on the boundary layer flow on the wafer surface in spin coating system

    NASA Astrophysics Data System (ADS)

    Kimura, Seiichi; Munekata, Mizue; Kurishima, Hiroaki; Matsuzaki, Kazuyoshi; Ohba, Hideki

    2005-06-01

    Recently, development of high technology has been required for the formation of thin uniform film in manufacturing processes of semiconductor as the semiconductor become more sophisticated. Spin coating is usually used for spreading photoresist on a wafer surface. However, since rotating speed of the disk is very high in spin coating, the dropped resist scatters outward and reattaches to the film surface. So, the scattered resist is removed by the exhaust flow generated at the gap between the wafer edge and the catch cup. It is seriously concemed that the stripes called Ekman spiral vortices appears on the disk in the case of high rotating speed and the film thickness increases near the wafer edge in the case of low rotating speed, because it prevent the formation of uniform film. The purpose of this study is to make clear the generation mechanism of Ekman spiral vortices and the influence of exhaust flow on it. Moreover the influence of the catch cup geometry on the wafer surface boundary layer flow is investigated.

  2. Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography

    NASA Astrophysics Data System (ADS)

    Stuerzebecher, Lorenz; Harzendorf, Torsten; Fuchs, Frank; Zeitner, Uwe D.

    2012-03-01

    One and two dimensional grating structures with submicron period have a huge number of applications in optics and photonics. Such structures are conventionally fabricated using interference or e-beam lithography. However, both technologies have significant drawbacks. Interference lithography is limited to rather simple geometries and the sequential writing scheme of e-beam lithography leads to time consuming exposures for each grating. We present a novel fabrication technique for this class of microstructures which is based on proximity lithography in a mask aligner. The technology is capable to pattern a complete wafer within less than one minute of exposure time and offers thereby high lateral resolution and a reliable process. Our advancements compared to standard mask aligner lithography are twofold: First of all, we are using periodic binary phase masks instead of chromium masks to generate an aerial image of high resolution and exceptional light efficiency at certain distances behind the mask. Second, a special mask aligner illumination set-up is employed which allows to precisely control the incidence angles of the exposure light. This degree of freedom allows both, to shape the aerial image (e. g. transformation of a periodic spot pattern into a chessboard pattern) and to increase its depth of focus considerably. That way, our technology enables the fabrication of high quality gratings with arbitrary geometry in a fast and stable wafer scale process.

  3. Design and development of wafer-level short wave infrared micro-camera

    NASA Astrophysics Data System (ADS)

    Sood, Ashok K.; Richwine, Robert A.; Pethuraja, Gopal; Puri, Yash R.; Lee, Je-Ung; Haldar, Pradeep; Dhar, Nibir K.

    2013-06-01

    Low cost IR Sensors are needed for a variety of Defense and Commercial Applications as low cost imagers for various Army and Marine missions. SiGe based IR Focal Planes offers a low cost alternative for developing wafer-level shortwave infrared micro-camera that will not require any cooling and can operate in the Visible-NIR band. The attractive features of SiGe based IRFPA's will take advantage of Silicon based technology, that promises small feature size and compatibility with the low power silicon CMOS circuits for signal processing. SiGe technology offers a low cost alternative for developing Visible-NIR sensors that will not require any cooling and can operate from 0.4- 1.7 microns. The attractive features of SiGe based IRFPA's will take advantage of Silicon based technology that can be processed on 12-inch silicon substrates, that can promise small feature size and compatibility with the Silicon CMOS circuit for signal processing. In this paper, we will discuss the design and development of Wafer-Level Short Wave Infrared (SWIR) Micro-Camera. We will discuss manufacturing approaches and sensor configurations for short wave infrared (SWIR) focal plane arrays (FPAs) that significantly reduce the cost of SWIR FPA packaging, optics and integration into micro-systems.

  4. An application of selective electrochemical wafer thinning for silicon characterization

    SciTech Connect

    Medernach, J.W.; Stein, H.J.; Stevenson, J.O.

    1990-01-01

    A new technique is reported for the rapid determination of interstitial oxygen (O{sub i}) in heavily doped n{sup +} and p{sup +} silicon. This technique includes application of a selective electrochemical thinning (SET) process and FTIR transmittance measurement on a limited area of a silicon wafer. The O{sub i} is calculated using ASTM F1188--88 with the IOC 88 calibration factor. An advantage of SET over mechanical thinning is that the original wafer thickness and diameter are maintained for additional processing. 1 tab.

  5. Noble approach for mask-wafer measurement by design-based metrology integration system

    NASA Astrophysics Data System (ADS)

    Mito, Hiroaki; Hayano, Katsuya; Maeda, Tatsuya; Mohri, Hiroshi; Sato, Hidetoshi; Matsuoka, Ryoichi; Sukegawa, Shigeki

    2009-10-01

    OPC technique is getting more complicated toward 32nm and below technology node, i.e. from moderate OPC to aggressive OPC. Also, various types of phase shift mask have been introduced, and then the manufacturing process of them is complicated now. In order to shorten TAT (Turn around time) time, mask technique need be considered in addition to lithography technique. Furthermore, the lens aberration of the exposure system is getting smaller, so the current performance of it is very close to the ideal. On the other hand, when down sizing goes down to 32nm technology node, it starts to be reported that there are cases that size cannot be matched between a mask pattern and the corresponding printed pattern. Therefore, it is very indispensable to understand the pattern sizes correlation between a mask and the corresponding printed wafer in order to improve the accuracy and the quality, in the situation that the device size is so small that low k1 lithography had been developed and widely used in a production. Then it is thought that it is one of the approaches to improve an estimated accuracy of lithography by using contour that was extracted from mask SEM image in addition to mask model. This paper describes a newly developed integration system in order to solve issues above, and the applications. This is a system which integrates CG4500; CD-SEM for mask and CG4000; CD SEM for wafer; using DesignGauge; OPC evaluation system by Hitachi High-Technologies. It was investigated that a measurement accuracy improvement by executing a mask-wafer same point measurement with same measurement algorithm utilizing the new system. At first, we measured patterns described on a mask and verified the validity based on a measurement value, picture, measurement parameter and the coordinate. Then create a job file for a wafer CD-SEM using the system so as to measure the same patterns that were exposed using the mask. In addition, average CD measurement was tried in order to improve the

  6. New approach for mask-wafer measurement by design-based metrology integration system

    NASA Astrophysics Data System (ADS)

    Maeda, Tatsuya; Hayano, Katsuya; Kawashima, Satoshi; Mohri, Hiroshi; Sakai, Hideo; Sato, Hiodetoshi; Matsuoka, Ryoichi; Nishihara, Makoto; Sukegawa, Shigeki

    2009-03-01

    OPC (Optical Proximity Correction) technique is getting more complicated towards 32 nm technology node and beyond, i.e. from moderate OPC to aggressive OPC. Also, various types of phase shift mask have been introduced, and their manufacturing process is complicated. In order to shorten TAT (Turn around time), mask design technique needs be considered in addition to lithography technique. Furthermore, the lens aberration of the exposure system is getting smaller, so its current performance is very close to the ideal. On the other hand, when down sizing of device feature size reaches the 32nm technology node, cases begin to be reported where the feature dimension is not matched between a mask pattern and the corresponding printed pattern. Therefore, it is indispensable to understand the pattern size correlation between a mask and the corresponding printed wafer in order to improve the processing accuracy and the quality in the situation where the device size is so small that the low k1 lithography is widely used in production. One of the approaches to improve the estimated accuracy of lithography is the use of contour data extracted from mask SEM image in addition to the application of a mask model. This paper describes a newly developed integration system that aims to solve the issues above, and its applications. This is a system that integrates mask CD-SEM (Critical Dimension-Scanning Electron Microscope) CG4500, wafer CD-SEM CG4000, OPC evaluation system DesignGauge, all manufactured by Hitachi High-Technologies. The measurement accuracy improvement was examined by executing a mask-wafer same point measurement, i.e. measurement of the corresponding points, with same measurement algorithm utilizing the new system. First, we measured mask patterns and verified the validity based on the measurement value, the image, the measurement parameter and the coordinates. Then a job file was formulated for a wafer CD-SEM using the new system so as to measure the corresponding

  7. A thick photoresist process for advanced wafer level packaging applications using JSR THB-151N negative tone UV photoresist

    NASA Astrophysics Data System (ADS)

    Srinivasa Rao, Vempati; Kripesh, Vaidyanathan; Yoon, Seung Wook; Tay, Andrew A. O.

    2006-09-01

    The development of thick photoresist molds using JSR THB-151N negative tone UV photoresist for the electroplating of interconnects in advanced packaging technologies has been demonstrated. Two different thick photoresist molds 65 and 130 µm high with aspect ratios of up to 2.6 have been fabricated with good reproducibility using single and double coating processes. Optimized lithography parameters using a UV aligner to achieve straight and near-vertical side-wall profiles are also reported. Near-vertical side walls similar to that obtained using SU-8 photoresist have been obtained. JSR photoresist has been found to be easily striped with no residues in solvent stripper solutions, making it suitable for wafer bumping applications and the processing of MEMS devices. Through-mold electroplating of copper and solder is also demonstrated. The simultaneous fabrication of 1167 000 high density interconnects on 8 inch wafers, using lithography and electroplating technologies, is also reported.

  8. Apparatus and method for measuring the thickness of a semiconductor wafer

    DOEpatents

    Ciszek, T.F.

    1995-03-07

    Apparatus for measuring thicknesses of semiconductor wafers is discussed, comprising: housing means for supporting a wafer in a light-tight environment; a light source mounted to the housing at one side of the wafer to emit light of a predetermined wavelength to normally impinge the wafer; a light detector supported at a predetermined distance from a side of the wafer opposite the side on which a light source impinges and adapted to receive light transmitted through the wafer; and means for measuring the transmitted light. 4 figs.

  9. Low-temperature thin-film indium bonding for reliable wafer-level hermetic MEMS packaging

    NASA Astrophysics Data System (ADS)

    Straessle, R.; Pétremand, Y.; Briand, D.; Dadras, M.; de Rooij, N. F.

    2013-07-01

    This paper reports on low-temperature and hermetic thin-film indium bonding for wafer-level encapsulation and packaging of delicate and temperature sensitive devices. This indium-bonding technology enables bonding of surface materials commonly used in MEMS technology. The temperature is kept below 140 °C for all process steps and no surface treatment is applied before and during bonding. This bonding technology allows hermetic sealing at 140 °C with a leak rate below 4 × 10-12 mbar l s-1 at room temperature. The tensile strength of the bonds up to 25 MPa goes along with a very high yield.

  10. Interaction of an argon plasma jet with a silicon wafer

    NASA Astrophysics Data System (ADS)

    Engelhardt, Max; Pothiraja, Ramasamy; Kartaschew, Konstantin; Bibinov, Nikita; Havenith, Martina; Awakowicz, Peter

    2016-04-01

    A filamentary discharge is ignited in an argon plasma jet under atmospheric pressure conditions. The gas discharge is characterized with voltage-current measurements, optical emission spectroscopy and an ICCD-camera with a high temporal resolution down to 10 ns. In the effluent of the plasma jet, filaments come into contact with the surface of a silicon wafer and modify it, namely etching traces are produced and microcrystals are deposited. These traces are studied with optical and electron microscopes. The material of the deposited microcrystals and the surface modifications of the silicon wafer are analyzed with Raman microspectroscopy. Amorphous silicon is found within the etching traces. The largest part of the deposited microcrystals are composed of nitratine (NaNO3) and some of them are calcite (CaCO3). Analyzing the possible reasons for the silicon wafer modifications we come to the conclusion that plasmoids, which are produced near the substrate surface by interaction with ionization waves, are a plausible explanation for the observed surface modifications of the silicon wafer.

  11. Ultra-Gradient Test Cavity for Testing SRF Wafer Samples

    SciTech Connect

    N.J. Pogue, P.M. McIntyre, A.I. Sattarov, C. Reece

    2010-11-01

    A 1.3 GHz test cavity has been designed to test wafer samples of superconducting materials. This mushroom shaped cavity, operating in TE01 mode, creates a unique distribution of surface fields. The surface magnetic field on the sample wafer is 3.75 times greater than elsewhere on the Niobium cavity surface. This field design is made possible through dielectrically loading the cavity by locating a hemisphere of ultra-pure sapphire just above the sample wafer. The sapphire pulls the fields away from the walls so the maximum field the Nb surface sees is 25% of the surface field on the sample. In this manner, it should be possible to drive the sample wafer well beyond the BCS limit for Niobium while still maintaining a respectable Q. The sapphire's purity must be tested for its loss tangent and dielectric constant to finalize the design of the mushroom test cavity. A sapphire loaded CEBAF cavity has been constructed and tested. The results on the dielectric constant and loss tangent will be presented

  12. Multi-wafer slicing with a fixed abrasive

    NASA Technical Reports Server (NTRS)

    Schmid, Frederick (Inventor); Khattak, Chandra P. (Inventor); Smith, Maynard B. (Inventor)

    1988-01-01

    A wafering machine having a multiplicity of wire cutting blades supported by a bladehead reciprocally moving past a workpiece supported by a holder that rocks about an axis perpendicular to the wires at a frequency less than the reciprocation of the bladehead.

  13. Crack propagation and fracture in silicon wafers under thermal stress

    PubMed Central

    Danilewsky, Andreas; Wittge, Jochen; Kiefl, Konstantin; Allen, David; McNally, Patrick; Garagorri, Jorge; Elizalde, M. Reyes; Baumbach, Tilo; Tanner, Brian K.

    2013-01-01

    The behaviour of microcracks in silicon during thermal annealing has been studied using in situ X-ray diffraction imaging. Initial cracks are produced with an indenter at the edge of a conventional Si wafer, which was heated under temperature gradients to produce thermal stress. At temperatures where Si is still in the brittle regime, the strain may accumulate if a microcrack is pinned. If a critical value is exceeded either a new or a longer crack will be formed, which results with high probability in wafer breakage. The strain reduces most efficiently by forming (hhl) or (hkl) crack planes of high energy instead of the expected low-energy cleavage planes like {111}. Dangerous cracks, which become active during heat treatment and may shatter the whole wafer, can be identified from diffraction images simply by measuring the geometrical dimensions of the strain-related contrast around the crack tip. Once the plastic regime at higher temperature is reached, strain is reduced by generating dislocation loops and slip bands and no wafer breakage occurs. There is only a small temperature window within which crack propagation is possible during rapid annealing. PMID:24046487

  14. Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

    SciTech Connect

    WRONOSKY,JOHN B.; SMITH,TONY G.; CRAIG,MARCUS J.; STURGIS,BEVERLY R.; DARNOLD,JOEL R.; WERLING,DAVID K.; KINCY,MARK A.; TICHENOR,DANIEL A.; WILLIAMS,MARK E.; BISCHOFF,PAUL

    2000-01-27

    This paper is an overview of the wafer and reticle positioning system of the Extreme Ultraviolet Lithography (EUVL) Engineering Test Stand (ETS). EUVL represents one of the most promising technologies for supporting the integrated circuit (IC) industry's lithography needs for critical features below 100nm. EUVL research and development includes development of capabilities for demonstrating key EUV technologies. The ETS is under development at the EUV Virtual National Laboratory, to demonstrate EUV full-field imaging and provide data that supports production-tool development. The stages and their associated metrology operated in a vacuum environment and must meet stringent outgassing specifications. A tight tolerance is placed on the stage tracking performance to minimize image distortion and provide high position repeatability. The wafer must track the reticle with less than {+-}3nm of position error and jitter must not exceed 10nm rms. To meet these performance requirements, magnetically levitated positioning stages utilizing a system of sophisticated control electronics will be used. System modeling and experimentation have contributed to the development of the positioning system and results indicate that desired ETS performance is achievable.

  15. Virtual fab flow for wafer topography aware OPC

    NASA Astrophysics Data System (ADS)

    Stock, Hans-Jürgen; Bomholt, Lars; Krüger, Dietmar; Shiely, James; Song, Hua; Voznesenskiy, Nikolay

    2010-04-01

    Small feature sizes down to the current 45 nm node and precision requirements of patterning in 193 nm lithography as well as layers where the wafer stack does not allow any BARC require - not only correction of optical proximity (OPC) effects originating from mask topography and imaging system, but also correction of wafer topography proximity (WTPC) effects as well. In spite of wafer planarization process steps, wafer topography (proximity) effects induced by different optical properties of the patterned materials start playing a significant role, and correction techniques need to be applied in order to minimize the impact. In this paper, we study a methodology to create fast models intended for effective use in OPC and WTPC procedures. In order to be short we use the terms "OPCWTPC modeling" and "OPCWTPC models" through the paper although it would be more correctly to take the terms "mask synthesis modeling" and "mask synthesis models". A comprehensive data set is required to build a reliable OPC model. We present a "virtual fab" concept using extensive test pattern sets with both 1D and 2D structures to capture optical proximity effects as well as wafer topography effects. A rigorous lithography simulator taking into account exposure tool source maps, topographic mask effects as well as wafer topography is used to generate virtual measurement data, which are used for model calibration as well as for model validation. For model building, we use a two step approach: in a first step, an OPC model is built using test patterns on a planar, homogenous substrate; in a second step a WTPC model is calibrated, using results from simulated test patterns on shallow trench isolation (STI) layer. This approach allows building models from experimental data, including hybrid approaches where only experimental data from planar substrates is available and a corresponding OPC model for the planar case can be retrofitted with capabilities for correcting wafer topography effects. We

  16. Face-to-face transfer of wafer-scale graphene films

    NASA Astrophysics Data System (ADS)

    Gao, Libo; Ni, Guang-Xin; Liu, Yanpeng; Liu, Bo; Castro Neto, Antonio H.; Loh, Kian Ping

    2014-01-01

    Graphene has attracted worldwide interest since its experimental discovery, but the preparation of large-area, continuous graphene film on SiO2/Si wafers, free from growth-related morphological defects or transfer-induced cracks and folds, remains a formidable challenge. Growth of graphene by chemical vapour deposition on Cu foils has emerged as a powerful technique owing to its compatibility with industrial-scale roll-to-roll technology. However, the polycrystalline nature and microscopic roughness of Cu foils means that such roll-to-roll transferred films are not devoid of cracks and folds. High-fidelity transfer or direct growth of high-quality graphene films on arbitrary substrates is needed to enable wide-ranging applications in photonics or electronics, which include devices such as optoelectronic modulators, transistors, on-chip biosensors and tunnelling barriers. The direct growth of graphene film on an insulating substrate, such as a SiO2/Si wafer, would be useful for this purpose, but current research efforts remain grounded at the proof-of-concept stage, where only discontinuous, nanometre-sized islands can be obtained. Here we develop a face-to-face transfer method for wafer-scale graphene films that is so far the only known way to accomplish both the growth and transfer steps on one wafer. This spontaneous transfer method relies on nascent gas bubbles and capillary bridges between the graphene film and the underlying substrate during etching of the metal catalyst, which is analogous to the method used by tree frogs to remain attached to submerged leaves. In contrast to the previous wet or dry transfer results, the face-to-face transfer does not have to be done by hand and is compatible with any size and shape of substrate; this approach also enjoys the benefit of a much reduced density of transfer defects compared with the conventional transfer method. Most importantly, the direct growth and spontaneous attachment of graphene on the underlying

  17. Face-to-face transfer of wafer-scale graphene films.

    PubMed

    Gao, Libo; Ni, Guang-Xin; Liu, Yanpeng; Liu, Bo; Castro Neto, Antonio H; Loh, Kian Ping

    2014-01-01

    Graphene has attracted worldwide interest since its experimental discovery, but the preparation of large-area, continuous graphene film on SiO2/Si wafers, free from growth-related morphological defects or transfer-induced cracks and folds, remains a formidable challenge. Growth of graphene by chemical vapour deposition on Cu foils has emerged as a powerful technique owing to its compatibility with industrial-scale roll-to-roll technology. However, the polycrystalline nature and microscopic roughness of Cu foils means that such roll-to-roll transferred films are not devoid of cracks and folds. High-fidelity transfer or direct growth of high-quality graphene films on arbitrary substrates is needed to enable wide-ranging applications in photonics or electronics, which include devices such as optoelectronic modulators, transistors, on-chip biosensors and tunnelling barriers. The direct growth of graphene film on an insulating substrate, such as a SiO2/Si wafer, would be useful for this purpose, but current research efforts remain grounded at the proof-of-concept stage, where only discontinuous, nanometre-sized islands can be obtained. Here we develop a face-to-face transfer method for wafer-scale graphene films that is so far the only known way to accomplish both the growth and transfer steps on one wafer. This spontaneous transfer method relies on nascent gas bubbles and capillary bridges between the graphene film and the underlying substrate during etching of the metal catalyst, which is analogous to the method used by tree frogs to remain attached to submerged leaves. In contrast to the previous wet or dry transfer results, the face-to-face transfer does not have to be done by hand and is compatible with any size and shape of substrate; this approach also enjoys the benefit of a much reduced density of transfer defects compared with the conventional transfer method. Most importantly, the direct growth and spontaneous attachment of graphene on the underlying

  18. Kinematical and mechanical aspects of wafer slicing

    NASA Astrophysics Data System (ADS)

    Werner, P. G.

    1982-02-01

    Some recently achieved results concerning the technological fundamentals of slurry sawing are presented. The specific material removal process and the related kinematic and geometric contact conditions between workpiece and saw blade are described. The result of a functional description of the slurry sawing process is presented, expressing the main process criteria, such as infeed per stroke, specific removal rate, specific tool wear, and vertical stroke intensity, in terms of the dominating process parameters, such as stroke length, width of workpiece, stroke frequency, specific cutting force and slurry specification.

  19. Bonding silicon-on-insulator to glass wafers for integrated bio-electronic circuits

    NASA Astrophysics Data System (ADS)

    Kim, Hyun S.; Blick, Robert H.; Kim, D. M.; Eom, C. B.

    2004-09-01

    We report a method for bonding silicon-on-insulator wafers onto glass wafers. After pre-cleaning the wafers by an ozone and ultraviolet exposure, followed by mega-sonic water rinse, the SOI wafers are bonded to glass wafers in a vacuum chamber. This is performed at a temperature of 400 °C under an applied voltage of 700 V. The interface between the glass and SOI wafer is tested mechanically and inspected by electron beam microscopy. Furthermore, we demonstrate removal of the silicon bulk layer after wafer bonding. The quality of the single crystalline Si thin film on the glass wafers has been verified by four-circle x-ray diffraction and scanning electron microscopy. This process will allow us the integration of thin-film electronics in biological sensor applications.

  20. In-situ detection method for wafer movement and micro-arc discharge around a wafer in plasma etching process using electrostatic chuck wafer stage with built-in acoustic emission sensor

    NASA Astrophysics Data System (ADS)

    Kasashima, Yuji; Tabaru, Tatsuo; Yasaka, Mitsuo; Kobayashi, Yoshikazu; Akiyama, Morito; Nabeoka, Natsuko; Motomura, Taisei; Sakamoto, Shingo; Uesugi, Fumihiko

    2014-01-01

    We report an electrostatic chuck (ESC) wafer stage with a built-in acoustic emission (AE) sensor for detecting anomalies occurring around a wafer during plasma etching. The built-in AE sensor detects acoustic waves caused by wafer movement and micro-arc discharge with high sensitivity, and identifies these anomalies based on the frequency characteristics of the waves. The results demonstrate the effectiveness of using an ESC wafer stage with a built-in AE sensor for in-situ anomaly detection, which can improve the production yield and overall equipment efficiency in large scale integrated circuit (LSI) manufacturing.