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Sample records for 1-v 90-nm cmos

  1. Radiation Performance of 1 Gbit DDR SDRAMs Fabricated in the 90 nm CMOS Technology Node

    NASA Technical Reports Server (NTRS)

    Ladbury, Raymond L.; Gorelick, Jerry L.; Berg, M. D.; Kim, H.; LaBel, K.; Friendlich, M.; Koga, R.; George, J.; Crain, S.; Yu, P.; Reed, R. A.

    2006-01-01

    We present Single Event Effect (SEE) and Total Ionizing Dose (TID) data for 1 Gbit DDR SDRAMs (90 nm CMOS technology) as well as comparing this data with earlier technology nodes from the same manufacturer.

  2. A 2x2 bit Vedic multiplier with different adders in 90nm CMOS technology

    NASA Astrophysics Data System (ADS)

    Jie, Lee Shing; Ruslan, Siti Hawa

    2017-09-01

    Adders play an important role in various arithmetic circuits such as multipliers. Speed and power consumption become very vital in multiplier design consideration to conserve energy. In this paper, a 2x2 bit Vedic multiplier has been designed using 3 different adder circuits. The first circuit is utilizing two half adders which used 3 transistors exclusive OR gate (3T XOR), the second circuit used two full adders with 6 transistors XOR (6T XOR) gate and the last circuit used two 13 transistors hybrid full adders (13T HFA). The adders used are combined with four AND gates to form a multiplier module to execute a Vedic mathematics algorithm. This algorithm satisfied the requirement of a fast multiplication operation because of the vertical and crosswise architecture from the Urdhva Triyakbyam Sutra which reduced the number of partial products compared to the conventional multiplication algorithm. The 2x2 bit multiplier is simulated using Synopsys Custom Tools using General Process Design Kit (GPDK) of 90 nm CMOS technology. Performance parameters such as power consumption and delay were compared as well as the swing of the output produced. With a 1 V voltage supply, the 2x2 Vedic multiplier with 13T HFA was found to be the best multiplier which produced a full output voltage swing even though the power consumption is second lowest at 22.96 µW and a delay of 47.70 ps. With the combination of hybrid full adder and Vedic mathematics, a new combination of multiplier method with low power and low delay has been successfully produced.

  3. 10-bit segmented current steering DAC in 90nm CMOS technology

    NASA Astrophysics Data System (ADS)

    Bringas, R., Jr.; Dy, F.; Gerasta, O. J.

    2015-06-01

    This special project presents a 10-Bit 1Gs/s 1.2V/3.3V Digital-to-Analog Converter using1 Poly 9 Metal SAED 90-nm CMOS Technology intended for mixed-signal and power IC applications. To achieve maximum performance with minimum area, the DAC has been implemented in 6+4 Segmentation. The simulation results show a static performance of ±0.56 LSB INL and ±0.79 LSB DNL with a total layout chip area of 0.683 mm2.The segmented architecture is implemented using two sub DAC's, which are the LSB and MSB section with certain number bits. The DAC is designed using 4-BitBinary Weighted DAC for the LSB section and 6-BitThermometer-coded DAC for the MSB section. The thermometer-coded architecture provides the most optimized results in terms of linearity through reducing the clock feed-through effect especially in hot switching between multiple transistors. The binary- weighted architecture gives better linearity output in higher frequencies with better saturation in current sources.

  4. Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node

    NASA Astrophysics Data System (ADS)

    Bunday, Benjamin D.; Bishop, Michael; Allgair, John A.

    2004-05-01

    The Advanced Metrology Advisory Group (AMAG) is a council composed of the chief CD-metrologists from the International SEMATECH Manufacturing Initiative (ISMI) consortium"s Member Companies and from the National Institute of Standards (NIST). The AMAG wrote and, in 2002, with CD-SEM supplier involvement, updated the "Unified Advanced CD-SEM Specification for Sub-130nm Technology (Version 2002)" to be a living document which outlines the required performance of advanced CD-SEMs for supplier compliance to the 2003 International Technology Roadmap for Semiconductors, and also conveys member companies" other collective needs to vendors. Through applying this specification during the mid-2003 timeframe, a benchmarking effort of the currently available advanced CD-SEMs has been performed. These results are presented here. The AMAG Unified Specification includes sections outlining the test methodologies, metrics, and wafer-target requirements for each parameter included in the benchmark, and, when applicable, prescribes a target specification compatible with the ITRS and methodologies compatible with the demands of 90nm technology. Parameters to be considered include: ×Precision, Repeatability and Reproducibility ×Accuracy, Apparent Beam Width and Resolution ×Charging and Contamination ×Tool-to-Tool Matching ×Pattern Recognition and Navigation Accuracy ×Throughput ×Instrumentation Outputs ×Tool Automation and Utility ×Precision and Accuracy of Profile Measurement ×Precision and Accuracy of Roughness Measurement. Previous studies under this same project have been published, with the initial version of the International Sematech Unified Specification in 1998, and multi-supplier benchmarks in 1999 and 2001. The results for the 2003 benchmark will be shown and compared to the ITRS, and composite viewpoints showing these 2003 benchmark results compared to the past results are also shown, demonstrating interesting CD-SEM industry trends.

  5. High-speed receiver based on waveguide germanium photodetector wire-bonded to 90nm SOI CMOS amplifier.

    PubMed

    Pan, Huapu; Assefa, Solomon; Green, William M J; Kuchta, Daniel M; Schow, Clint L; Rylyakov, Alexander V; Lee, Benjamin G; Baks, Christian W; Shank, Steven M; Vlasov, Yurii A

    2012-07-30

    The performance of a receiver based on a CMOS amplifier circuit designed with 90nm ground rules wire-bonded to a waveguide germanium photodetector is characterized at data rates up to 40Gbps. Both chips were fabricated through the IBM Silicon CMOS Integrated Nanophotonics process on specialty photonics-enabled SOI wafers. At the data rate of 28Gbps which is relevant to the new generation of optical interconnects, a sensitivity of -7.3dBm average optical power is demonstrated with 3.4pJ/bit power-efficiency and 0.6UI horizontal eye opening at a bit-error-rate of 10(-12). The receiver operates error-free (bit-error-rate < 10(-12)) up to 40Gbps with optimized power supply settings demonstrating an energy efficiency of 1.4pJ/bit and 4pJ/bit at data rates of 32Gbps and 40Gbps, respectively, with an average optical power of -0.8dBm.

  6. A high current gain gate-controlled lateral bipolar junction transistor with 90 nm CMOS technology for future RF SoC applications

    NASA Astrophysics Data System (ADS)

    Chen, Shuo-Mao; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, I. C.; Chiang, Yen-Ting

    2008-08-01

    A CMOS-compatible gate-controlled lateral BJT (GC-LBJT) was prepared with a conventional 90 nm CMOS technology for radio frequency system-on-chip (RF SoC) applications. The emitter injection efficiency and the doping profile in P-well were optimized by properly controlling source, drain, and well implants. Consequently, the GC-LBJT with a gate length of 0.15 μm can achieve a current gain over 2000 and 17/19 GHz for the fT/fmax, respectively, which are 1000%, 200%, and 60% improvements in current gain, fT and fmax, respectively as compared to the LBJT reported previously.

  7. Low power and high accuracy spike sorting microprocessor with on-line interpolation and re-alignment in 90 nm CMOS process.

    PubMed

    Chen, Tung-Chien; Ma, Tsung-Chuan; Chen, Yun-Yu; Chen, Liang-Gee

    2012-01-01

    Accurate spike sorting is an important issue for neuroscientific and neuroprosthetic applications. The sorting of spikes depends on the features extracted from the neural waveforms, and a better sorting performance usually comes with a higher sampling rate (SR). However for the long duration experiments on free-moving subjects, the miniaturized and wireless neural recording ICs are the current trend, and the compromise on sorting accuracy is usually made by a lower SR for the lower power consumption. In this paper, we implement an on-chip spike sorting processor with integrated interpolation hardware in order to improve the performance in terms of power versus accuracy. According to the fabrication results in 90nm process, if the interpolation is appropriately performed during the spike sorting, the system operated at the SR of 12.5 k samples per second (sps) can outperform the one not having interpolation at 25 ksps on both accuracy and power.

  8. A 2.5 mW/ch, 50 Mcps, 10-Analog Channel, Adaptively Biased Read-Out Front-End IC With Low Intrinsic Timing Resolution for Single-Photon Time-of-Flight PET Applications With Time-Dependent Noise Analysis in 90 nm CMOS.

    PubMed

    Cruz, Hugo; Huang, Hong-Yi; Luo, Ching-Hsing; Lee, Shuenn-Yuh

    2017-04-01

    This paper presents a 10-channel time-of-flight application-specific integrated circuit (ASIC) for positron emission tomography in a 90 nm standard CMOS process. To overcome variations in channel-to-channel timing resolution caused by mismatch and process variations, adaptive biases and a digital-to-analog converter (DAC) are utilized. The main contributions of this work are as follows. First, multistage architectures reduce the total power consumption, and detection bandwidths of analog preamplifiers and comparators are increased to 1 and 1.5 GHz, respectively, relative to those in previous studies. Second, a total intrinsic electronic timing resolution of 9.71 ps root-mean-square (RMS) is achieved (13.88 ps peak and 11.8 ps average of the 10 channels in 5 ASICs). Third, the proposed architecture reduces variations in channel-to-channel timing resolution to 2.6 bits (equivalent to 4.17 ps RMS) by calibrating analog comparator threshold levels. A 181.5 ps full-width-at-half-maximum timing resolution is measured with an avalanche photo diode and a laser setup. The power consumption is 2.5 mW using 0.5 and 1.2 V power supplies. The proposed ASIC is implemented in a 90 nm TSMC CMOS process with a total area of 3.3 mm × 2.7 mm.

  9. 25Gb/s 1V-driving CMOS ring modulator with integrated thermal tuning.

    PubMed

    Li, Guoliang; Zheng, Xuezhe; Yao, Jin; Thacker, Hiren; Shubin, Ivan; Luo, Ying; Raj, Kannan; Cunningham, John E; Krishnamoorthy, Ashok V

    2011-10-10

    We report a high-speed ring modulator that fits many of the ideal qualities for optical interconnect in future exascale supercomputers. The device was fabricated in a 130 nm SOI CMOS process, with 7.5 μm ring radius. Its high-speed section, employing PN junction that works at carrier-depletion mode, enables 25 Gb/s modulation and an extinction ratio >5 dB with only 1V peak-to-peak driving. Its thermal tuning section allows the device to work in broad wavelength range, with a tuning efficiency of 0.19 nm/mW. Based on microwave characterization and circuit modeling, the modulation energy is estimated ~7 fJ/bit. The whole device fits in a compact 400 μm2 footprint.

  10. A Near 1-V Operational, 0.18-µm CMOS Passive Sigma-Delta Modulator with 77dB of Dyanamic Range

    NASA Astrophysics Data System (ADS)

    Sai, Toru; Sugimoto, Yasuhiro

    A low-voltage operational capability near 1V along with low noise and distortion characteristics have been realized in a passive sigma-delta modulator. To achieve low-voltage operation, the dc voltage in signal paths in the switched-capacitor-filter section was set to be 0.2V so that sufficient gate-to-source voltages were obtained for metal-oxide-semiconductor (MOS) switches in signal paths without using a gate-voltage boosting technique. In addition, the input switch that connects the input signal from the outside to the inside of an integrated circuit chip was replaced by a passive resistor to eliminate a floating switch, and gain coefficients in the feedback and input paths were modified so that the bias voltage of the digital-to-analog converter could be set to VDD and 0V to easily activate MOS switches. As the signal swing becomes small under low-voltage operational circumstances, correlated double sampling was used to suppress the offset voltage and the 1/f noise that appeared at the input of a comparator. The modulator was fabricated using a standard CMOS 0.18-µm process, and the measured results show that the modulator realized 77dB of dynamic range for 40kHz of signal bandwidth with a 40MHz sampling rate while dissipating 2mW from a 1.1V supply voltage.

  11. Practicality of Evaluating Soft Errors in Commercial sub-90 nm CMOS for Space Applications

    NASA Technical Reports Server (NTRS)

    Pellish, Jonathan A.; LaBel, Kenneth A.

    2010-01-01

    The purpose of this presentation is to: Highlight space memory evaluation evolution, Review recent developments regarding low-energy proton direct ionization soft errors, Assess current space memory evaluation challenges, including increase of non-volatile technology choices, and Discuss related testing and evaluation complexities.

  12. A 1 V 186-μW 50-MS/s 10-bit subrange SAR ADC in 130-nm CMOS process

    NASA Astrophysics Data System (ADS)

    Mingyuan, Yu; Ting, Li; Jiaqi, Yang; Shuangshuang, Zhang; Fujiang, Lin; Lin, He

    2016-07-01

    This paper presents a 10-bit 50-MS/s subrange successive-approximation register (SAR) analog-to-digital converter (ADC) composed of a 4-bit SAR coarse ADC and a 6-bit SAR fine ADC. In the coarse ADC, multi-comparator SAR architecture is used to reduce the digital logic propagation delay, and a traditional asynchronous SAR ADC with monotonic switching method is used as the fine ADC. With that combination, power dissipation also can be much reduced. Meanwhile, a modified SAR control logic is adopted in the fine ADC to speed up the conversion and other techniques, such as splitting capacitors array, are borrowed to reduce the power consumption. Fabricated with 1P8M 130-nm CMOS technology, the proposed SAR ADC achieves 51.6-dB signal to noise and distortion ratio (SNDR) and consumes 186 μW at 50 MS/s with a 1-V supply, resulting in a figure of merit (FOM) of 12 fJ/conversion-step. The core area is only 0.045 mm2. Project supported by the National Natural Science Foundation of China (Nos. 61204033, 61331015), the Fundamental Research Funds for the Central Universities (No. WK2100230015), and the Funds of Science and Technology on Analog Integrated Circuit Laboratory (No. 9140C090111150C09041).

  13. A robust 45 nm gate-length CMOSFET for 90 nm Hi-speed technology

    NASA Astrophysics Data System (ADS)

    Lim, K. Y.; Chan, V.; Rengarajan, R.; Lee, H. K.; Rovedo, N.; Lim, E. H.; Yang, S.; Jamin, F.; Nguyen, P.; Lin, W.; Lai, C. W.; Teh, Y. W.; Lee, J.; Kim, L.; Luo, Z.; Ng, H.; Sudijono, J.; Wann, C.; Yang, I.

    2006-04-01

    We have developed a robust 45 nm gate-length CMOSFET for 90 nm node high performance application. Aggressive gate length and gate dielectric scaling along with optimized strain engineering enable high performance device similar to 65 nm node CMOSFET [Nakahara Y, et al. IEDM Tech Dig 2003;281] We have utilized oxy-nitride gate with post-nitridation anneal, high ramp rate spike anneal, low temperature spacer scheme and stress controlled SiN contact etch stop liner process in order to improve drive current as well as transistor short-channel roll-off. In particular, we will focus on the study of middle-of-line (MOL) process parameters, (i.e. MOL thermal expense and mechanical stress from contact etch stop liner) on transistor performance and reliability. Based on the study, we have obtained device exhibit drive-current of 900/485 μA/μm for NMOSFET and PMOSFET, respectively, at standard supply voltage of 1 V.

  14. 324GHz CMOS VCO Using Linear Superimposition Technique

    NASA Technical Reports Server (NTRS)

    Daquan, Huang; LaRocca, Tim R.; Samoska, Lorene A; Fung, Andy; Chang, Frank

    2007-01-01

    Terahertz (frequencies ranged from 300GHz to 3THz) imaging and spectroscopic systems have drawn increasing attention recently due to their unique capabilities in detecting and possibly analyzing concealed objects. The generation of terahertz signals is nonetheless nontrivial and traditionally accomplished by using either free-electron radiation, optical lasers, Gunn diodes or fundamental oscillation by using III-V based HBT/HEMT technology[1-3]... We have substantially extended the operation range of deep-scaled CMOS by using a linear superimposition method, in which we have realized a 324GHz VCO in 90nm digital CMOS with 4GHz tuning range under 1V supply voltage. This may also pave the way for ultra-high data rate wireless communications beyond that of IEEE 802.15.3c and reach data rates comparable to that of fiber optical communications, such as OC768 (40Gbps) and beyond.

  15. Methodology for a sub-90nm contact layer OPC with DFM flow demonstration

    NASA Astrophysics Data System (ADS)

    Hung, Chi-Yuan; Zhang, Bin; Zhang, Jian; Xing, GuoQiang

    2005-01-01

    Extensive usage of Litho RET, Etch trimming and OPC techniques has become common practice in the integrated patterning flow for 90nm and beyond. In this paper, we will discuss our approach to use OPC for both etch and litho through-pitch bias correction for a 90nm contact layer. In stead of using conventional lumped model, [J.P. Stirniman, M.L. Rieger, SPIE Proc. Optical/Laser Microlithography X, Vol. 3051, p294, 1997], we introduced an alternative modeling approach to reduce our model correction into: Corrected Mask Layout = Tmask-1 (Toptical-1 (Tetch-1 (Design Layout) ) ). Post OPC checking using Synopsys SiVl platform shows that CD 3σ = 7.82nm of through-pitch OPC residual error. This study also shows that integrated patterning flow combined with LRC tools is useful to provide feedback to the designer and highlight some patterning process limitation that is design dependent.

  16. Pump-probe photoelectron spectroscopy by a high-power 90 nm vacuum-ultraviolet laser

    NASA Astrophysics Data System (ADS)

    Sato, Motoki; Suzuki, Yoshi-ichi; Suzuki, Toshinori; Adachi, Shunsuke

    2016-02-01

    We present pump-probe photoelectron spectroscopy of Kr and NO using a high-power vacuum-ultraviolet (VUV) laser at a wavelength of 90 nm. Clear quantum beats are observed in the photoelectron angular distributions as well as in the photoelectron yields, resulting from the coherent excitation of two Kr Rydberg states by the VUV pump. The entire Franck-Condon envelope of the NO A(2Σ+) excited state is also successfully captured by the VUV probe.

  17. FPGA chip performance improvement with gate shrink through alternating PSM 90nm process

    NASA Astrophysics Data System (ADS)

    Yu, Chun-Chi; Shieh, Ming-Feng; Liu, Erick; Lin, Benjamin; Ho, Jonathan; Wu, Xin; Panaite, Petrisor; Chacko, Manoj; Zhang, Yunqiang; Lei, Wen-Kang

    2005-11-01

    In the post-physical verification space called 'Mask Synthesis' a key component of design-for-manufacturing (DFM), double-exposure based, dark-field, alternating PSM (Alt-PSM) is being increasingly applied at the 90nm node in addition with other mature resolution enhancement techniques (RETs) such as optical proximity correction (OPC) and sub-resolution assist features (SRAF). Several high-performance IC manufacturers already use alt-PSM technology in 65nm production. At 90nm having strong control over the lithography process is a critical component in meeting targeted yield goals. However, implementing alt-PSM in production has been challenging due to several factors such as phase conflict errors, mask manufacturing, and the increased production cost due to the need for two masks in the process. Implementation of Alt-PSM generally requires phase compliance rules and proper phase topology in the layout and this has been successful for the technology node with these rules implemented. However, this may not be true for a mature, production process technology, in this case 90 nm. Especially, in the foundry-fabless business model where the foundry provides a standard set of design rules to its customers for a given process technology, and where not all the foundry customers require Alt-PSM in their tapeout flow. With minimum design changes, design houses usually are motivated by higher product performance for the existing designs. What follows is an in-depth review of the motivation to apply alt-PSM on a production FPGA, the DFM challenges to each partner faced, its effect on the tapeout flow, and how design, manufacturing, and EDA teams worked together to resolve phase conflicts, tapeout the chip, and finally verify the silicon results in production.

  18. Resolution of 90 nm (lambda/5) in an optical transmission microscope with an annular condenser.

    PubMed

    Vainrub, Arnold; Pustovyy, Oleg; Vodyanoy, Vitaly

    2006-10-01

    Resolution of 90 nm was achieved with a research microscope simply by replacing the standard bright-field condenser with a homebuilt illumination system with a cardioid annular condenser. Diffraction gratings with 100 nm width lines as well as less than 100 nm size features of different-shaped objects were clearly visible on a calibrated microscope test slide. The resolution increase results from a known narrower diffraction pattern in coherent illumination for the annular aperture compared with the circular aperture. This explanation is supported by an excellent accord of calculated and measured diffraction patterns for a 50 nm radius disk.

  19. Resolution of 90 nm (λ/5) in an optical transmission microscope with an annular condenser

    NASA Astrophysics Data System (ADS)

    Vainrub, Arnold; Pustovyy, Oleg; Vodyanoy, Vitaly

    2006-10-01

    Resolution of 90 nm was achieved with a research microscope simply by replacing the standard bright-field condenser with a homebuilt illumination system with a cardioid annular condenser. Diffraction gratings with 100 nm width lines as well as less than 100 nm size features of different-shaped objects were clearly visible on a calibrated microscope test slide. The resolution increase results from a known narrower diffraction pattern in coherent illumination for the annular aperture compared with the circular aperture. This explanation is supported by an excellent accord of calculated and measured diffraction patterns for a 50 nm radius disk.

  20. Comparison of ArF bilayer resists for sub-90 nm L/S fabrication

    NASA Astrophysics Data System (ADS)

    Hong, Jin; Kim, Hyun-Woo; Lee, Sung-Ho; Woo, Sang-Gyun; Cho, Han-Ku; Han, Woo-Sung

    2003-06-01

    The advent of 193nm ArF lithography opened new era of sub-90nm patterning in DRAM industry. ArF lithography in single layer scheme, however, has limitation in the substrate fabrication of sub-90nm L/S due to the decreased physical thickness of resist less that 3000Å and soft chemical structure of resist. Bilayer scheme, composed of Si-containing top PR and thick organic bottom layer, is gaining attention for its capability of patterning and control of resist thickness as a substitute for single layer. Several resists were evaluated for bilayer process in terms of photo patterning, dry development, bottom PR durability and SEM shrinkage. Resolution down to 80nm was achieved with Si content in the range of 8-9%. Etch selectivity in the dry development was a strong function of Si content and chemical structure of tope PR with pitch size dependence based on O2/N2 gas chemistry in dual frequency plasma tool. Profile control after dry development was subject to change depending on the gas ration (O2/N2) and power. Resist structure was proved to be a key factor in bottom PR durability at the substrate etch condition. Best combination of top and bottom resists in bilayer scheme will be discussed.

  1. A 1V low power second-order delta-sigma modulator for biomedical signal application.

    PubMed

    Hsu, Chih-Han; Tang, Kea-Tiong

    2013-01-01

    This paper presents the design and implementation of a low-power delta-sigma modulator for biomedical application with a standard 90 nm CMOS technology. The delta-sigma architecture is implemented as 2nd order feedforward architecture. A low quiescent current operational transconductance amplifier (OTA) is utilized to reduce power consumption. This delta-sigma modulator operated in 1V power supply, and achieved 64.87 dB signal to noise distortion ratio (SNDR) at 10 KHz bandwidth with an oversampling ratio (OSR) of 64. The power consumption is 17.14 µW, and the figure-of-merit (FOM) is 0.60 pJ/conv.

  2. Dimensional crossover and weak localization in a 90 nm n-GaAs thin film

    PubMed Central

    Gilbertson, A. M.; Newaz, A. K. M.; Chang, Woo-Jin; Bashir, R.; Solin, S. A.; Cohen, L. F.

    2009-01-01

    We report on the magnetotransport in a 90 nm thick n-type GaAs epitaxial thin film in the weak localization (WL) regime. Low temperature (T≤50 K) magnetotransport data are fit with WL theory, from which the phase coherence time, τϕ∝T−p (p=1.22±0.01), are extracted. We conclude that the dominant dephasing mechanism at these temperatures is electron-electron (e-e) scattering in the Nyquist limit. Evidence of a crossover from two-dimensional to three-dimensional behavior with respect to both coherent transport (WL) and e-e interactions is observed in the temperature dependence of the zero-field conductivity and τϕ, respectively. PMID:19668705

  3. 90nm node contact hole patterning through applying model based OPC in KrF lithography

    NASA Astrophysics Data System (ADS)

    Jeon, Young-Doo; Lee, Sang-Uk; Choi, Jaeyoung; Kim, Jeahee; Han, Jaewon

    2008-03-01

    As semiconductor technologies move toward 90nm generation and below, contact hole is one of the most challenging features to print in the semiconductor manufacturing process. There are two principal difficulties in order to define small contact hole pattern on wafer. One is insufficient process margin besides poor resolution compared with line & space pattern. The other is that contact hole should be made through pitches and sometimes random contact hole pattern should be fabricated. Therefore advanced ArF lithography scanner should be used for small contact hole printing with RETs (Resolution Enhancement Techniques) such as immersion lithography, OPC(Optical Proximity Correction), PSM(Phase Shift Mask), high NA(Numerical Aperture), OAI(Off-Axis Illumination), SRAF(Sub-resolution Assistant Feature), mask biasing and thermal flow. Like this, ArF lithography propose the method of enhancing resolution, however, we must spend an enormous amount of CoC(cost of ownership) to utilize ArF photolithography process than KrF. In this paper, we suggest the method of contact holes patterning by using KrF lithography tool in 90nm sFlash(stand alone Flash)devices. For patterning of contact hole, we apply RETs which combine OAI and Model based OPC. Additionally, in this paper we present the result of hole pattern images which operate ArF lithography equipment. Also, this study describes comparison of two wafer images that ArF lithography process which is used mask biasing and Rule based OPC, KrF lithography process which is applied hybrid OPC.

  4. Patterning of 90nm node flash contact hole with assist feature using KrF

    NASA Astrophysics Data System (ADS)

    Shim, Yeonah; Jun, Sungho; Choi, Jaeyoung; Choi, Kwangseon; Han, Jae-won; Wang, Kechang; McCarthy, John; Xiao, Guangming; Dai, Grace; Son, DongHwan; Zhou, Xin; Cecil, Thomas; Kim, David; Baik, KiHo

    2009-10-01

    Patterning of contact holes using KrF lithography system is one of the most challenging tasks for the sub-90nm technology node,. Contact hole patterns can be printed with a KrF lithography system using Off-Axis Illumination (OAI) such as Quasar or Quadrupole. However, such a source usually offers poor image contrast and poor depth of focus (DOF), especially for isolated contact holes. In addition to image contrast and DOF, circularity of hole shape is also an important parameter for device performance. Sub-resolution assist features (SRAF) can be used to improve the image contrast, DOF and circularity for isolated contact holes. Application of SRAFs, modifies the intensity profile of isolated features to be more like dense ones, improving the focal response of the isolated feature. The insertion of SRAFs in a contact design is most commonly done using rule-based scripting, where the initial rules for configuring the SRAFs are derived using a simulation tool to determining the distance of assist features to main feature, and the size and number of assist features to be used.. However in the case of random contact holes, rule-based SRAF placement is a nearly impossible task. To address this problem, an inverse lithography technique was successfully used to treat random contact holes. The impact of SRAF configuration on pattern profile, especially circularity and process margin, is demonstrated. It is also shown that the experimental data are easily predicted by calibrating aerial image simulation results. Finally, a methodology for optimizing SRAF rules using inverse lithography technology is described.

  5. Asymmetric MQW semiconductor optical amplifier with low-polarization sensitivity of over 90-nm bandwidth

    NASA Astrophysics Data System (ADS)

    Nkanta, Julie E.; Maldonado-Basilio, Ramón; Abdul-Majid, Sawsan; Zhang, Jessica; Hall, Trevor J.

    2013-12-01

    An exhausted capacity of current Passive Optical Networks has been anticipated as bandwidth-hungry applications such as HDTV and 3D video become available to end-users. To enhance their performance, the next generation optical access networks have been proposed, using optical carriers allocated within the E-band (1360-1460 nm). It is partly motivated by the low-water peak fiber being manufactured by Corning. At these wavelengths, choices for low cost optical amplifiers, with compact size, low energy consumption and feasibility for integration with other optoelectronic components are limited, making the semiconductor optical amplifiers (SOA) a realistic solution. An experimental characterization of a broadband and low polarization sensitive asymmetric multi quantum well (MQW) SOA operating in the E-band is reported. The SOA device is composed of nine 6 nm In1-xGaxAsyP1-y 0.2% tensile strained asymmetric MQW layers sandwiched between nine latticed matched 6 nm InGaAsP barrier layers. The active region is grown on an n-doped InP substrate and buried by p-doped InGaAsP layers. The SOA devices have 7-degrees tilt anti-reflected coated facets, with 2 μm ridge width, and a cavity length of 900 μm. For input powers of -10 dBm and -20 dBm, a maximum gain of 20 dB at 1360 nm with a polarization insensitivity under 3 dB for over 90 nm bandwidth is measured. Polarization sensitivity of less than 0.5 dB is observed for some wavelengths. Obtained results indicate a promising SOA with broadband amplification, polarization insensitivity and high gain. These SOAs were designed and characterized at the Photonics Technology Laboratory, University of Ottawa, Canada.

  6. DOE experiment for scattering bars optimization at the 90nm node

    NASA Astrophysics Data System (ADS)

    Bouton, G.; Connolly, B.; Courboin, D.; Di Giacomo, A.; Gasnier, F.; Lallement, R.; Parker, D.; Pindo, M.; Richoilley, J. C.; Royere, F.; Rameau-Savio, A.; Tissier, M.

    2011-03-01

    Scattering bars (SB) are sub-resolution lines added to the original database during Resolution Enhancement Techniques (RET) treatments. Their goal is stabilizing the CD of the adjacent polygons (by suppressing or reducing secondary diffraction waves). SB increase the process window in the litho process by lowering the first derivative of the CD. Moreover, the detailed knowledge of SB behavior around the fab working point is a must for future shrinks and for preparing the next technology nodes. SB are inserted in the generation of critical levels for STMicroelectronics 90 nm technology embedded memories before invoking the Model for Optical Proximity Corrections (MBOPC). This allows the software to calculate their contribution to the intensity in the aerial image and integrate their effects in Edge Proximity Error (EPE) corrections. However the Rule-Based insertion of these assist features still leaves behind occurrences of conflicting priorities as in the image below. (See manuscript PDF)Detection of Hot Spots in 2D simulations for die treatment validation (done on BRION equipment on each critical level before mask making) is in most cases correlated with SB singularities, at least for CD non-uniformity, bridging issues and necking in correspondence with OPC fragmentation effects. Within the framework of the MaXSSIMM project, we established a joint STMicroelectronics and Toppan Photomasks team to explore the influence of assist features (CD, distance), convex and concave corner rounding and CD uniformity by means of specific test patterns. The proposed study concerns the algorithms used to define the mask shop input as well as the physical mask etching. A set of test cases, based on elementary test patterns, each one including a list of geometrical variations, has been defined. As the number of configurations becomes rapidly very large (tens of thousands) we had to apply Design of Experiments (DOE) algorithms in order to reduce the number of measurements to a

  7. Phase-change memory technology with self-aligned μTrench cell architecture for 90 nm node and beyond

    NASA Astrophysics Data System (ADS)

    Pirovano, A.; Pellizzer, F.; Tortorelli, I.; Riganó, A.; Harrigan, R.; Magistretti, M.; Petruzza, P.; Varesi, E.; Redaelli, A.; Erbetta, D.; Marangon, T.; Bedeschi, F.; Fackenthal, R.; Atwood, G.; Bez, R.

    2008-09-01

    A novel self-aligned μTrench-based cell architecture for phase change memory (PCM) process is presented. The low programming current and the good dimensional control of the sub-lithographic features achieved with the μTrench structure are combined with a self-aligned patterning strategy that simplify the integration process in term of alignment tolerances and of number of critical masks. The proposed architecture has been integrated in a 90 nm 128 Mb vehicle based on a pnp bipolar junction transistor for the array selection. The good active and leakage currents achieved by the purposely optimized selecting transistors combined with programming currents of 300 μA of the storage element and good distributions measured on the 128 Mb array demonstrate the suitability of the proposed architecture for the production of high-density PCM arrays at 90 nm and beyond.

  8. A New Method for Investigation of the Hair Shaft: Hard X-Ray Microscopy with a 90-nm Spatial Resolution

    PubMed Central

    Jeon, Soo-Young; Goo, Ja Woong; Hong, Seung Phil; Oh, Tak Heon; Youn, Hwa Shik

    2008-01-01

    Various methods have been used to investigate the hair shaft. In the ultrastructural hair field, scanning and transmission electron microscopies are widely used investigative methods, but they have some technical limitations. Recently, X-ray microscopes with sub-micron spatial resolution have emerged as useful instruments because they offer a unique opportunity to observe the interior of an undamaged sample in greater detail. In this report, we examined damaged hair shaft tips using hard X-ray microscopy with a 90 nm spatial resolution. The results of this study suggest that hard X-ray microscopy is an alternative investigative method for hair morphology studies. PMID:18452275

  9. Performance Analysis of Si3N4 Capping Layer and SOI Technology in Sub 90 nm PMOS Device

    NASA Astrophysics Data System (ADS)

    Rahim, Noor Ashikin Binti Abdul; Abdullah, Mohd. Hanapiah B.; Rusop, Mohamad

    2009-06-01

    This technical paper investigates the electrical analysis in sub 90 nm of PMOS. The investigation was carried out by using two different methods which is PMOS with strained silicon and Silicon-on-Insulator (SOI) technology. Strained silicon engineering has become a key innovation to enhance device on current. Recently, SOI technology has been widely accepted for use in mainstream high performance logic applications due to some advantageous offered over the bulk silicon. The performance of the devices is analyzed by focusing on the electrical characteristics of Id-Vd and Id-Vg curves for three different structures. Firstly, PMOS with strained silicon of Si3N4 capping layer covering the gate area and secondly the device with and without SOI technology. The fabrication process simulation was simulated by using SILVACO TCAD ATHENA simulator and the electrical characteristic was simulated by SILVACO TCAD ATLAS simulator to obtain Id-Vd and Id-Vg curves. A fruitful and knowledgeable results were reported from this paper, it could be seen that high tensile strain introduced to the device causing the drain current to decreased from Id(bulk) = -400 uA/um of bulk to Id(Strain) = -310 uA/um which is about 25% of decrement. Since the drain current decreased, the carrier mobility and the performance also decreased proportional to drain current. However when SOI technology is applied to the PMOS device, the drain current was increased up to Id(SOI) = -431 uA/um over the bulk, the increment of about 9.25% reported. A higher Id-Vg curve and lower threshold of about pVth(SOI) = -0.2178 V also reported from this paper which tells that the device with SOI technology exhibits low power consumption device and fast switching which in turns contribute to a faster performance.

  10. Ion traps fabricated in a CMOS foundry

    SciTech Connect

    Mehta, K. K.; Ram, R. J.; Eltony, A. M.; Chuang, I. L.; Bruzewicz, C. D.; Sage, J. M. Chiaverini, J.

    2014-07-28

    We demonstrate trapping in a surface-electrode ion trap fabricated in a 90-nm CMOS (complementary metal-oxide-semiconductor) foundry process utilizing the top metal layer of the process for the trap electrodes. The process includes doped active regions and metal interconnect layers, allowing for co-fabrication of standard CMOS circuitry as well as devices for optical control and measurement. With one of the interconnect layers defining a ground plane between the trap electrode layer and the p-type doped silicon substrate, ion loading is robust and trapping is stable. We measure a motional heating rate comparable to those seen in surface-electrode traps of similar size. This demonstration of scalable quantum computing hardware utilizing a commercial CMOS process opens the door to integration and co-fabrication of electronics and photonics for large-scale quantum processing in trapped-ion arrays.

  11. Flexible CMOS low-noise amplifiers for beyond-3G wireless hand-held devices

    NASA Astrophysics Data System (ADS)

    Becerra-Alvarez, Edwin C.; Sandoval-Ibarra, Federico; de la Rosa, José M.

    2009-05-01

    This paper explores the use of reconfigurable Low-Noise Amplifiers (LNAs) for the implementation of CMOS Radio Frequency (RF) front-ends in the next generation of multi-standard wireless transceivers. Main circuit strategies reported so far for multi-standard LNAs are reviewed and a novel flexible LNA intended for Beyond-3G RF hand-held terminals is presented. The proposed LNA circuit consists of a two-stage topology that combines inductive-source degeneration with PMOS-varactor based tuning network and a programmable load to adapt its performance to different standard specifications without penalizing the circuit noise and with a reduced number of inductors as compared to previous reported reconfigurable LNAs. The circuit has been designed in a 90-nm CMOS technology to cope with the requirements of the GSM, WCDMA, Bluetooth and WLAN (IEEE 802.11b-g) standards. Simulation results, including technology and packaging parasitics, demonstrate correct operation of the circuit for all the standards under study, featuring NF<2.8dB, S21>13.3dB and IIP3>10.9dBm, over a 1.85GHz-2.4GHz band, with an adaptive power consumption between 17mW and 22mW from a 1-V supply voltage. Preliminary experimental measurements are included, showing a correct reconfiguration operation within the operation band.

  12. Optimization of building blocks for multi-stage 17-44 dB 6.1-9.6 mW 90-nm K-band front-ends

    NASA Astrophysics Data System (ADS)

    Roy, Apratim; Harun Rashid, A. B. M.

    2013-12-01

    In this article, five two-stage ˜6-mW and four three-stage ˜9-mW matched amplifier architectures are proposed to establish optimization procedure and quantify relative merits of cascode (CC), common-gate (CG), and commonsource (CS) building blocks for low-voltage low-power multi-stage front-ends. The circuits are simulated with a 90-nm CMOS technology including modeling of layout parasites. Integrated bias trees and passive port matching networks are incorporated in the K-band designs. In the face of process mismatch, variability in noise and gain figures remains <0.39 dB and <7.1 dB from the design values. The five combinations of building blocks in twostage low-power (6.1-6.6 mW) amplifiers achieve linearity (IIP3) in the range of -5.2˜-13.5 dBm, good reverse isolation (better than -26 dB), 2.89-3.82 dB noise penalties, and 17.2-25.5 dB peak forward gain. In case of threestage front-ends built with CS, CC, and CG blocks (power rating 9.2-9.6 mW), forward gain and optimized noise figures are found as >33 dB and <3.26 dB, respectively. They achieve -2.5˜18.3 dBm IIP3, <-39 dB reverse isolation, and <-17 dB minimum IRL. The results are compared with reported simulated findings on CMOS multistage amplifiers to highlight their relative advantages in terms of power requirement and decibel(gain)-per-watt.

  13. A gate-width scalable 90-nm MOSFET nonlinear model including DC/RF dispersion effects valid up to 50 GHz

    NASA Astrophysics Data System (ADS)

    Yu, Panpan; Ling, Sun; Tian, Xuenong; Cheng, Jiali; Gao, Jianjun

    2017-09-01

    An improved deep sub-micrometer (90 nm) large signal model for silicon-based MOSFET that incorporates DC/AC dispersion model is proposed. The derived DC model can accurately predict the device current-voltage behavior over the wide range of bias points and the corresponding extraction method for model parameters is investigated. The improvement also consists of new equations for the nonlinear capacitance phenomenon in the saturation region using few fitting parameters, and emphasizes for the particularly difficult problems associated with the DC/RF dispersion. Model verification is carried out by comparison of measured and simulated S-parameters for 90 nm gate-length MOSFET devices point up to 50 GHz. Good agreement is obtained between measured and modeled results and the scalability of model is also verified in this paper.

  14. Advanced mask technique to improve bit line CD uniformity of 90 nm node flash memory in low-k1 lithography

    NASA Astrophysics Data System (ADS)

    Kim, Jong-doo; Choi, Jae-young; Kim, Jea-hee; Han, Jae-won

    2008-10-01

    As devices size move toward 90nm technology node or below, defining uniform bit line CD of flash devices is one of the most challenging features to print in KrF lithography. There are two principal difficulties in defining bit line on wafer. One is insufficient process margin besides poor resolution compared with ArF lithography. The other is that asymmetric bit line should be made for OPC(Optical Proximity Correction) modeling. Therefore advanced ArF lithography scanner should be used for define bit line with RETs (Resolution Enhancement Techniques) such as immersion lithography, OPC, PSM(Phase Shift Mask), high NA(Numerical Aperture), OAI(Off-Axis Illumination), SRAF(Sub-resolution Assistant Feature), and mask biasing.. Like this, ArF lithography propose the method of enhancing resolution, however, we must spend an enormous amount of CoC(cost of ownership) to utilize ArF photolithography process than KrF. In this paper, we suggest method to improve of bit line CD uniformity, patterned by KrF lithographic process in 90nm sFlash(stand alone Flash) devices. We applied new scheme of mask manufacturing, which is able to realize 2 different types of mask, binary and phase-shift, into one plate. Finally, we could get the more uniform bit lines and we expect to get more stable properties then before applying this technique.

  15. Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC

    NASA Astrophysics Data System (ADS)

    Roy, Sabita; Van Den Broeke, Douglas J.; Chen, J. F.; Liebchen, Armin; Chen, Ting; Hsu, Stephen D.; Shi, Xuelong; Socha, Robert J.

    2004-05-01

    Under low-k1 patterning constraints, it has been a challenge for the lithography process to meet the aggressive IC design rule requirements for the 90nm and the upcoming 65nm nodes. From the imaging perspective, we see the geometric design rules are largely governed by numerical aperture (NA), illumination settings, and OPC for any resolution enhancement technique (RET) applied mask. We report a case study of exploring a set of process feasible design rule criteria based on a state-of-the-art μProcessor chip that contains three different styles of circuit design - standard library cell (SLC), random logic (RML), and SRAM. To keep the packing density higher for SRAM, the critical criteria for design rules involve achievable minimum pitch, sufficient area of contact-landing pad, minimum line end shortening (LES) to ensure poly endcap, and preferably to have optimum pitch for the placement of Scattering Bars (SB). For RML, the goal is to achieve the printing of ever smaller critical dimension (CD) with a greater CD uniformity control. The SLC should be designed to be comparable with both RML and SRAM devices. Hence, the design rule constraints for CD, space, line end, minimum pitch, and SB placement for SLC cell is critically confined. Unlike the traditional method of assuming a linear scaling for the design rule set, we explore achievable design rule criteria for very low k1 imaging by simultaneously optimizing NA, illumination settings, and OPC (for the optimum placement of SB) for a calibrated process. This is done by analyzing the CD control and the maximum overlapped process window for critical lines, spaces, line ends, and with the respective k1 factor for the three types of circuits. For 90nm node with k1 as low as 0.36, a feasible set of design rules for the μProcessor chip can be obtained using 6% attPSM with 6% exposure latitude at 400nm of overlapped depth of focus. Using the similar approach for the scaled down 65nm 6% attPSM, it resulted inadequate

  16. Optimization of resist shrink techniques for contact hole and metal trench ArF lithography at the 90-nm technology node

    NASA Astrophysics Data System (ADS)

    Wallace, Christine; Schacht, Jochen; Huang, I. H.; Hsu, Ruei H.

    2004-05-01

    Two fundamentally different approaches for chemical ArF resist shrinkage are evaluated and integrated into process flows for 90 nm technology node. The chemical shrink and the corresponding gain in process window is studied in detail for different resist types with respect to CD uniformity through pitch, linearity and resist profiles. For both, SAFIER and RELACS material, the sensitivity of the shrink process with respect to the baking temperature is characterized by a temperature matrix to check process stability, and optimized conditions are found offering an acceptable amount of shrinkage at contact and trench levels. For the SAFIER material, thermal flow contributes to the chemical shrink which is a function of the photoresist chemistry and its hydrodynamic properties depending on the resists" glass transition temperature (Tg) and the baking temperature: at baking temperatures close to Tg, a proximity and pattern dependent shrink is observed. For a given resist, line-space patterns and contact holes shrink differently, and their resist profiles are affected significantly. Additionally, the chemical shrinkage depends on the size of contact holes and resist profile prior to the application of the SAFIER process. At baking temperatures below Tg some resists exhibit no shrink at all. The RELACS technique offers a constant shrink for contacts at various pitches and sizes. This shrink can be moderately adjusted and controlled by varying the mixing bake temperature which is generally and preferably below the glass transistion temperature of the resist, therefore no resist profile degradation is observed. A manufacturable process with a shrink of 20nm using RELACS at the contact layer is demonstrated. Utilizing an increased reticle bias in combination with an increased CD target prior to the chemical shrink, the common lithography process window at contact layer was increased by 0.15um. The results also indicate a possibility for an extension of the shrink to greater

  17. A scalable neural chip with synaptic electronics using CMOS integrated memristors.

    PubMed

    Cruz-Albrecht, Jose M; Derosier, Timothy; Srinivasa, Narayan

    2013-09-27

    The design and simulation of a scalable neural chip with synaptic electronics using nanoscale memristors fully integrated with complementary metal-oxide-semiconductor (CMOS) is presented. The circuit consists of integrate-and-fire neurons and synapses with spike-timing dependent plasticity (STDP). The synaptic conductance values can be stored in memristors with eight levels, and the topology of connections between neurons is reconfigurable. The circuit has been designed using a 90 nm CMOS process with via connections to on-chip post-processed memristor arrays. The design has about 16 million CMOS transistors and 73 728 integrated memristors. We provide circuit level simulations of the entire chip performing neuronal and synaptic computations that result in biologically realistic functional behavior.

  18. CAOS-CMOS camera.

    PubMed

    Riza, Nabeel A; La Torre, Juan Pablo; Amin, M Junaid

    2016-06-13

    Proposed and experimentally demonstrated is the CAOS-CMOS camera design that combines the coded access optical sensor (CAOS) imager platform with the CMOS multi-pixel optical sensor. The unique CAOS-CMOS camera engages the classic CMOS sensor light staring mode with the time-frequency-space agile pixel CAOS imager mode within one programmable optical unit to realize a high dynamic range imager for extreme light contrast conditions. The experimentally demonstrated CAOS-CMOS camera is built using a digital micromirror device, a silicon point-photo-detector with a variable gain amplifier, and a silicon CMOS sensor with a maximum rated 51.3 dB dynamic range. White light imaging of three different brightness simultaneously viewed targets, that is not possible by the CMOS sensor, is achieved by the CAOS-CMOS camera demonstrating an 82.06 dB dynamic range. Applications for the camera include industrial machine vision, welding, laser analysis, automotive, night vision, surveillance and multispectral military systems.

  19. DFM in practice: results of a three way partnership between a leading fabless design house, foundry, and EDA company to implement alternating-phase shift mask (Alt-PSM) on a 90-nm FPGA chip

    NASA Astrophysics Data System (ADS)

    Yu, Chun-Chi; Shieh, Ming-Feng; Liu, Erick; Lin, Benjamin; Lin, Henry; Chacko, Manoj; Li, Xiaoyang; Lei, Wen-Kang; Ho, Jonathan; Wu, Xin

    2005-05-01

    At the sub 90nm nodes, resolution enhancement techniques (RETs) such as optical proximity correction (OPC), phase-shifting masks (PSM), sub-resolution assist features (SRAF) have become essential steps in the post-physical verification 'Mask Synthesis' process and a key component of design for manufacturing (DFM). Several studies have been conducted and the results have been published on the implication and application of the different types of RETs on mask printability and costs. More specifically, double-exposure-based, dark-field, alternating PSM (Alt-PSM) technology has received lot of attention with respect to the mask manufacturing challenges and its implementation into a production flow, despite its yield and critical dimension (CD) control superiority. Implementation of Alt-PSM generally requires phase compliance rules and proper phase topology in the layout and this has been successful for the technology node with these rules implemented. However, this may not be true for a matured, production process technology, in this case 90 nm. Especially, in the foundry-fabless business model where the foundry provides a standard set of design rules to its customers for a given process technology, and where not all the foundry customers require Alt-PSM in their tapeout flow. What follows is an in-depth review of the DFM challenges to each partner faced, its effect on the tapeout flow, and how design, manufacturing, and EDA teams worked together to resolve phase conflicts, tapeout the chip, and finally verify the silicon results in production.

  20. Equalizing Si photodetectors fabricated in standard CMOS processes

    NASA Astrophysics Data System (ADS)

    Guerrero, E.; Aguirre, J.; Sánchez-Azqueta, C.; Royo, G.; Gimeno, C.; Celma, S.

    2017-05-01

    This work presents a new continuous-time equalization approach to overcome the limited bandwidth of integrated CMOS photodetectors. It is based on a split-path topology that features completely decoupled controls for boosting and gain; this capability allows a better tuning of the equalizer in comparison with other architectures based on the degenerated differential pair, which is particularly helpful to achieve a proper calibration of the system. The equalizer is intended to enhance the bandwidth of CMOS standard n-well/p-bulk differential photodiodes (DPDs), which falls below 10MHz representing a bottleneck in fully integrated optoelectronic interfaces to fulfill the low-cost requirements of modern smart sensors. The proposed equalizer has been simulated in a 65nm CMOS process and biased with a single supply voltage of 1V, where the bandwidth of the DPD has been increased up to 3 GHz.

  1. Implantable CMOS Biomedical Devices

    PubMed Central

    Ohta, Jun; Tokuda, Takashi; Sasagawa, Kiyotaka; Noda, Toshihiko

    2009-01-01

    The results of recent research on our implantable CMOS biomedical devices are reviewed. Topics include retinal prosthesis devices and deep-brain implantation devices for small animals. Fundamental device structures and characteristics as well as in vivo experiments are presented. PMID:22291554

  2. Depletion-mode carrier-plasma optical modulator in zero-change advanced CMOS.

    PubMed

    Shainline, Jeffrey M; Orcutt, Jason S; Wade, Mark T; Nammari, Kareem; Moss, Benjamin; Georgas, Michael; Sun, Chen; Ram, Rajeev J; Stojanović, Vladimir; Popović, Miloš A

    2013-08-01

    We demonstrate the first (to the best of our knowledge) depletion-mode carrier-plasma optical modulator fabricated in a standard advanced complementary metal-oxide-semiconductor (CMOS) logic process (45 nm node SOI CMOS) with no process modifications. The zero-change CMOS photonics approach enables this device to be monolithically integrated into state-of-the-art microprocessors and advanced electronics. Because these processes support lateral p-n junctions but not efficient ridge waveguides, we accommodate these constraints with a new type of resonant modulator. It is based on a hybrid microring/disk cavity formed entirely in the sub-90 nm thick monocrystalline silicon transistor body layer. Electrical contact of both polarities is made along the inner radius of the multimode ring cavity via an array of silicon spokes. The spokes connect to p and n regions formed using transistor well implants, which form radially extending lateral junctions that provide index modulation. We show 5 Gbps data modulation at 1265 nm wavelength with 5.2 dB extinction ratio and an estimated 40 fJ/bit energy consumption. Broad thermal tuning is demonstrated across 3.2 THz (18 nm) with an efficiency of 291 GHz/mW. A single postprocessing step to remove the silicon handle wafer was necessary to support low-loss optical confinement in the device layer. This modulator is an important step toward monolithically integrated CMOS photonic interconnects.

  3. Building strong partnerships with CMOs.

    PubMed

    Dye, Carson F

    2014-07-01

    CFOs and chief medical officers (CMOs) can build on common traits to form productive partnerships in guiding healthcare organizations through the changes affecting the industry. CFOs can strengthen bonds with CMOs by taking steps to engage physicians on their own turf--by visiting clinical locations and attending medical-executive committee meetings, for example. Steps CFOs can take to help CMOs become more acquainted with the financial operations of health systems include demonstrating the impact of clinical decisions on costs and inviting CMOs to attend finance-related meetings.

  4. Regenerative switching CMOS system

    DOEpatents

    Welch, James D.

    1998-01-01

    Complementary Metal Oxide Semiconductor (CMOS) Schottky barrier Field Effect Transistor systems, which are a seriesed combination of N and P-Channel MOSFETS, in which Source Schottky barrier junctions of the N and P-Channel Schottky barrier MOSFETS are electically interconnected, (rather than the Drains as in conventional diffused junction CMOS), which Schottky barrier MOSFET system demonstrates Regenerative Inverting Switching Characteristics in use are disclosed. Both the N and P-Channel Schottky barrier MOSFET devices are unique in that they provide operational Drain Current vs. Drain to Source voltage as a function of Gate voltage only where the polarities of the Drain voltage and Gate voltage are opposite, referenced to the Source as a common terminal, and where the polarity of the voltage applied to the Gate is appropriate to cause Channel inversion. Experimentally derived results which demonstrate and verify the operation of N and P-Channel Schottky barrier MOSFETS actually fabricated on P and N-type Silicon respectively, by a common procedure using vacuum deposited Chromium as a Schottky barrier forming metal, are also provided.

  5. Regenerative switching CMOS system

    DOEpatents

    Welch, J.D.

    1998-06-02

    Complementary Metal Oxide Semiconductor (CMOS) Schottky barrier Field Effect Transistor systems, which are a series combination of N and P-Channel MOSFETS, in which Source Schottky barrier junctions of the N and P-Channel Schottky barrier MOSFETS are electrically interconnected, (rather than the Drains as in conventional diffused junction CMOS), which Schottky barrier MOSFET system demonstrates Regenerative Inverting Switching Characteristics in use are disclosed. Both the N and P-Channel Schottky barrier MOSFET devices are unique in that they provide operational Drain Current vs. Drain to Source voltage as a function of Gate voltage only where the polarities of the Drain voltage and Gate voltage are opposite, referenced to the Source as a common terminal, and where the polarity of the voltage applied to the Gate is appropriate to cause Channel inversion. Experimentally derived results which demonstrate and verify the operation of N and P-Channel Schottky barrier MOSFETS actually fabricated on P and N-type Silicon respectively, by a common procedure using vacuum deposited Chromium as a Schottky barrier forming metal, are also provided. 14 figs.

  6. CMOS array design automation techniques

    NASA Technical Reports Server (NTRS)

    Lombardi, T.; Feller, A.

    1976-01-01

    The design considerations and the circuit development for a 4096-bit CMOS SOS ROM chip, the ATL078 are described. Organization of the ATL078 is 512 words by 8 bits. The ROM was designed to be programmable either at the metal mask level or by a directed laser beam after processing. The development of a 4K CMOS SOS ROM fills a void left by available ROM chip types, and makes the design of a totally major high speed system more realizable.

  7. Large area CMOS image sensors

    NASA Astrophysics Data System (ADS)

    Turchetta, R.; Guerrini, N.; Sedgwick, I.

    2011-01-01

    CMOS image sensors, also known as CMOS Active Pixel Sensors (APS) or Monolithic Active Pixel Sensors (MAPS), are today the dominant imaging devices. They are omnipresent in our daily life, as image sensors in cellular phones, web cams, digital cameras, ... In these applications, the pixels can be very small, in the micron range, and the sensors themselves tend to be limited in size. However, many scientific applications, like particle or X-ray detection, require large format, often with large pixels, as well as other specific performance, like low noise, radiation hardness or very fast readout. The sensors are also required to be sensitive to a broad spectrum of radiation: photons from the silicon cut-off in the IR down to UV and X- and gamma-rays through the visible spectrum as well as charged particles. This requirement calls for modifications to the substrate to be introduced to provide optimized sensitivity. This paper will review existing CMOS image sensors, whose size can be as large as a single CMOS wafer, and analyse the technical requirements and specific challenges of large format CMOS image sensors.

  8. MonoColor CMOS sensor

    NASA Astrophysics Data System (ADS)

    Wang, Ynjiun P.

    2009-02-01

    A new breed of CMOS color sensor called MonoColor sensor is developed for a barcode reading application in AIDC industry. The RGBW color filter array (CFA) in a MonoColor sensor is arranged in a 8 x 8 pixels CFA with only 4 pixels of them are color (RGB) pixels and the rest of 60 pixels are transparent or monochrome. Since the majority of pixels are monochrome, MonoColor sensor maintains 98% barcode decode performance compared with a pure monochrome CMOS sensor. With the help of monochrome and color pixel fusion technique, the resulting color pictures have similar color quality in terms of Color Semantic Error (CSE) compared with a Bayer pattern (RGB) CMOS color camera. Since monochrome pixels are more sensitive than color pixels, a MonoColor sensor produces in general about 2X brighter color picture and higher luminance pixel resolution.

  9. A CMOS floating point multiplier

    NASA Astrophysics Data System (ADS)

    Uya, M.; Kaneko, K.; Yasui, J.

    1984-10-01

    This paper describes a 32-bit CMOS floating point multiplier. The chip can perform 32-bit floating point multiplication (based on the proposed IEEE Standard format) and 24-bit fixed point multiplication (two's complement format) in less than 78.7 and 71.1 ns, respectively, and the typical power dissipation is 195 mW at 10 million operations per second. High-speed multiplication techniques - a modified Booth's allgorithm, a carry save adder scheme, a high-speed CMOS full adder, and a modified carry select adder - are used to achieve the above high performance. The chip is designed for compatibility with 16-bit microcomputer systems, and is fabricated in 2 micron n-well CMOS technology; it contains about 23000 transistors of 5.75 x 5.67 sq mm in size.

  10. CMOS Integrated Carbon Nanotube Sensor

    SciTech Connect

    Perez, M. S.; Lerner, B.; Boselli, A.; Lamagna, A.; Obregon, P. D. Pareja; Julian, P. M.; Mandolesi, P. S.; Buffa, F. A.

    2009-05-23

    Recently carbon nanotubes (CNTs) have been gaining their importance as sensors for gases, temperature and chemicals. Advances in fabrication processes simplify the formation of CNT sensor on silicon substrate. We have integrated single wall carbon nanotubes (SWCNTs) with complementary metal oxide semiconductor process (CMOS) to produce a chip sensor system. The sensor prototype was designed and fabricated using a 0.30 um CMOS process. The main advantage is that the device has a voltage amplifier so the electrical measure can be taken and amplified inside the sensor. When the conductance of the SWCNTs varies in response to media changes, this is observed as a variation in the output tension accordingly.

  11. Reliability in CMOS IC processing

    NASA Technical Reports Server (NTRS)

    Shreeve, R.; Ferrier, S.; Hall, D.; Wang, J.

    1990-01-01

    Critical CMOS IC processing reliability monitors are defined in this paper. These monitors are divided into three categories: process qualifications, ongoing production workcell monitors, and ongoing reliability monitors. The key measures in each of these categories are identified and prioritized based on their importance.

  12. Development of CMOS integrated circuits

    NASA Technical Reports Server (NTRS)

    Bertino, F.; Feller, A.; Greenhouse, J.; Lombardi, T.; Merriam, A.; Noto, R.; Ozga, S.; Pryor, R.; Ramondetta, P.; Smith, A.

    1979-01-01

    Report documents life cycles of two custom CMOS integrated circuits: (1) 4-bit multiplexed register with shift left and shift right capabilities, and (2) dual 4-bit registers. Cycles described include conception as logic diagrams through design, fabrication, testing, and delivery.

  13. Digital-Centric RF CMOS Technologies

    NASA Astrophysics Data System (ADS)

    Matsuzawa, Akira

    Analog-centric RFCMOS technology has played an important role in motivating the change of technology from conventional discrete device technology or bipolar IC technology to CMOS technology. However it introduces many problems such as poor performance, susceptibility to PVT fluctuation, and cost increase with technology scaling. The most important advantage of CMOS technology compared with legacy RF technology is that CMOS can use more high performance digital circuits for very low cost. In fact, analog-centric RF-CMOS technology has failed the FM/AM tuner business and the digital-centric CMOS technology is becoming attractive for many users. It has many advantages; such as high performance, no external calibration points, high yield, and low cost. From the above facts, digital-centric CMOS technology which utilizes the advantages of digital technology must be the right path for future RF technology. Further investment in this technology is necessary for the advancement of RF technology.

  14. Portable design rules for bulk CMOS

    NASA Technical Reports Server (NTRS)

    Griswold, T. W.

    1982-01-01

    It is pointed out that for the past several years, one school of IC designers has used a simplified set of nMOS geometric design rules (GDR) which is 'portable', in that it can be used by many different nMOS manufacturers. The present investigation is concerned with a preliminary set of design rules for bulk CMOS which has been verified for simple test structures. The GDR are defined in terms of Caltech Intermediate Form (CIF), which is a geometry-description language that defines simple geometrical objects in layers. The layers are abstractions of physical mask layers. The design rules do not presume the existence of any particular design methodology. Attention is given to p-well and n-well CMOS processes, bulk CMOS and CMOS-SOS, CMOS geometric rules, and a description of the advantages of CMOS technology.

  15. Research on evaluation method of CMOS camera

    NASA Astrophysics Data System (ADS)

    Zhang, Shaoqiang; Han, Weiqiang; Cui, Lanfang

    2014-09-01

    In some professional image application fields, we need to test some key parameters of the CMOS camera and evaluate the performance of the device. Aiming at this requirement, this paper proposes a perfect test method to evaluate the CMOS camera. Considering that the CMOS camera has a big fixed pattern noise, the method proposes the `photon transfer curve method' based on pixels to measure the gain and the read noise of the camera. The advantage of this method is that it can effectively wipe out the error brought by the response nonlinearity. Then the reason of photoelectric response nonlinearity of CMOS camera is theoretically analyzed, and the calculation formula of CMOS camera response nonlinearity is deduced. Finally, we use the proposed test method to test the CMOS camera of 2560*2048 pixels. In addition, we analyze the validity and the feasibility of this method.

  16. CMOS output buffer wave shaper

    NASA Technical Reports Server (NTRS)

    Albertson, L.; Whitaker, S.; Merrell, R.

    1990-01-01

    As the switching speeds and densities of Digital CMOS integrated circuits continue to increase, output switching noise becomes more of a problem. A design technique which aids in the reduction of switching noise is reported. The output driver stage is analyzed through the use of an equivalent RLC circuit. The results of the analysis are used in the design of an output driver stage. A test circuit based on these techniques is being submitted to MOSIS for fabrication.

  17. CMOS Image Sensors for High Speed Applications.

    PubMed

    El-Desouki, Munir; Deen, M Jamal; Fang, Qiyin; Liu, Louis; Tse, Frances; Armstrong, David

    2009-01-01

    Recent advances in deep submicron CMOS technologies and improved pixel designs have enabled CMOS-based imagers to surpass charge-coupled devices (CCD) imaging technology for mainstream applications. The parallel outputs that CMOS imagers can offer, in addition to complete camera-on-a-chip solutions due to being fabricated in standard CMOS technologies, result in compelling advantages in speed and system throughput. Since there is a practical limit on the minimum pixel size (4∼5 μm) due to limitations in the optics, CMOS technology scaling can allow for an increased number of transistors to be integrated into the pixel to improve both detection and signal processing. Such smart pixels truly show the potential of CMOS technology for imaging applications allowing CMOS imagers to achieve the image quality and global shuttering performance necessary to meet the demands of ultrahigh-speed applications. In this paper, a review of CMOS-based high-speed imager design is presented and the various implementations that target ultrahigh-speed imaging are described. This work also discusses the design, layout and simulation results of an ultrahigh acquisition rate CMOS active-pixel sensor imager that can take 8 frames at a rate of more than a billion frames per second (fps).

  18. Low power analog front-end electronics in deep submicrometer CMOS technology based on gain enhancement techniques

    NASA Astrophysics Data System (ADS)

    Gómez-Galán, J. A.; Sánchez-Rodríguez, T.; Sánchez-Raya, M.; Martel, I.; López-Martín, A.; Carvajal, R. G.; Ramírez-Angulo, J.

    2014-06-01

    This paper evaluates the design of front-end electronics in modern technologies to be used in a new generation of heavy ion detectors—HYDE (FAIR, Germany)—proposing novel architectures to achieve high gain in a low voltage environment. As conventional topologies of operational amplifiers in modern CMOS processes show limitations in terms of gain, novel approaches must be raised. The work addresses the design using transistors with channel length of no more than double the feature size and a supply voltage as low as 1.2 V. A front-end system has been fabricated in a 90 nm process including gain boosting techniques based on regulated cascode circuits. The analog channel has been optimized to match a detector capacitance of 5 pF and exhibits a good performance in terms of gain, speed, linearity and power consumption.

  19. High-sensitivity 2.5-μm pixel CMOS image sensor realized using Cu interconnect layers

    NASA Astrophysics Data System (ADS)

    Tatani, Keiji; Enomoto, Yoshiyuki; Yamamoto, Atsuhiko; Goto, Takayuki; Abe, Hideshi; Hirayama, Teruo

    2006-02-01

    We have adapted Cu interconnect layers to realize a high sensitivity in a small-pixel CMOS image sensor with a pixel size of 2.5 × 2.5 μm. We used the 1P3M CMOS process, and applied Back End of Line (BEOL) with a design rule equivalent to the 90-nm process. The Cu process features a fill factor that is about 15% greater and an interconnect layer height about 40% less than those of the Al process. As a result, the sensitivity at F5.6 is about 5% greater, while that at F1.2 is about 30% greater. One of problems with the Cu process is the stopper film of the Cu that interferes with the light. Furthermore, this stopper film interacts with the SiO II layers to form a multilayer, which leads to a discontinuity in the reflection characteristics at some wavelengths (ripple). Our method involves removing the stopper films together with all the layers. We have also adopted the use of an inner lens. Using these methods, we were able to eliminate the problem of discontinuity in the reflection at some wavelengths. Another problem is the deterioration in the shading characteristics of the optical black area where the black standard is assumed, due to the fact that the Cu interconnect layer is much thinner than the Al interconnect layer. We confirmed that the optical black shading characteristic could be satisfied by using a color filter with the Cu interconnect layer. To realize a 2.5μm pixel CMOS image sensor, we developed the Cu interconnect process. As a result, we created a high-sensitivity CMOS image sensor. This technology should enable the further reduction of the pixel size to less than 2.5 μm.

  20. JPL CMOS Active Pixel Sensor Technology

    NASA Technical Reports Server (NTRS)

    Fossum, E. R.

    1995-01-01

    This paper will present the JPL-developed complementary metal- oxide-semiconductor (CMOS) active pixel sensor (APS) technology. The CMOS APS has achieved performance comparable to charge coupled devices, yet features ultra low power operation, random access readout, on-chip timing and control, and on-chip analog to digital conversion. Previously published open literature will be reviewed.

  1. CMOS foveal image sensor chip

    NASA Technical Reports Server (NTRS)

    Bandera, Cesar (Inventor); Scott, Peter (Inventor); Sridhar, Ramalingam (Inventor); Xia, Shu (Inventor)

    2002-01-01

    A foveal image sensor integrated circuit comprising a plurality of CMOS active pixel sensors arranged both within and about a central fovea region of the chip. The pixels in the central fovea region have a smaller size than the pixels arranged in peripheral rings about the central region. A new photocharge normalization scheme and associated circuitry normalizes the output signals from the different size pixels in the array. The pixels are assembled into a multi-resolution rectilinear foveal image sensor chip using a novel access scheme to reduce the number of analog RAM cells needed. Localized spatial resolution declines monotonically with offset from the imager's optical axis, analogous to biological foveal vision.

  2. Nanosecond monolithic CMOS readout cell

    DOEpatents

    Souchkov, Vitali V.

    2004-08-24

    A pulse shaper is implemented in monolithic CMOS with a delay unit formed of a unity gain buffer. The shaper is formed of a difference amplifier having one input connected directly to an input signal and a second input connected to a delayed input signal through the buffer. An elementary cell is based on the pulse shaper and a timing circuit which gates the output of an integrator connected to the pulse shaper output. A detector readout system is formed of a plurality of elementary cells, each connected to a pixel of a pixel array, or to a microstrip of a plurality of microstrips, or to a detector segment.

  3. Hybrid CMOS/Molecular Integrated Circuits

    NASA Astrophysics Data System (ADS)

    Stan, M. R.; Rose, G. S.; Ziegler, M. M.

    CMOS silicon technologies are likely to run out of steam in the next 10-15 years despite revolutionary advances in the past few decades. Molecular and other nanoscale technologies show significant promise but it is unlikely that they will completely replace CMOS, at least in the near term. This chapter explores opportunities for using CMOS and nanotechnology to enhance and complement each other in hybrid circuits. As an example of such a hybrid CMOS/nano system, a nanoscale programmable logic array (PLA) based on majority logic is described along with its supplemental CMOS circuitry. It is believed that such systems will be able to sustain the historical advances in the semiconductor industry while addressing manufacturability, yield, power, cost, and performance challenges.

  4. A CMOS silicon spin qubit

    NASA Astrophysics Data System (ADS)

    Maurand, R.; Jehl, X.; Kotekar-Patil, D.; Corna, A.; Bohuslavskyi, H.; Laviéville, R.; Hutin, L.; Barraud, S.; Vinet, M.; Sanquer, M.; de Franceschi, S.

    2016-11-01

    Silicon, the main constituent of microprocessor chips, is emerging as a promising material for the realization of future quantum processors. Leveraging its well-established complementary metal-oxide-semiconductor (CMOS) technology would be a clear asset to the development of scalable quantum computing architectures and to their co-integration with classical control hardware. Here we report a silicon quantum bit (qubit) device made with an industry-standard fabrication process. The device consists of a two-gate, p-type transistor with an undoped channel. At low temperature, the first gate defines a quantum dot encoding a hole spin qubit, the second one a quantum dot used for the qubit read-out. All electrical, two-axis control of the spin qubit is achieved by applying a phase-tunable microwave modulation to the first gate. The demonstrated qubit functionality in a basic transistor-like device constitutes a promising step towards the elaboration of scalable spin qubit geometries in a readily exploitable CMOS platform.

  5. A CMOS silicon spin qubit

    PubMed Central

    Maurand, R.; Jehl, X.; Kotekar-Patil, D.; Corna, A.; Bohuslavskyi, H.; Laviéville, R.; Hutin, L.; Barraud, S.; Vinet, M.; Sanquer, M.; De Franceschi, S.

    2016-01-01

    Silicon, the main constituent of microprocessor chips, is emerging as a promising material for the realization of future quantum processors. Leveraging its well-established complementary metal–oxide–semiconductor (CMOS) technology would be a clear asset to the development of scalable quantum computing architectures and to their co-integration with classical control hardware. Here we report a silicon quantum bit (qubit) device made with an industry-standard fabrication process. The device consists of a two-gate, p-type transistor with an undoped channel. At low temperature, the first gate defines a quantum dot encoding a hole spin qubit, the second one a quantum dot used for the qubit read-out. All electrical, two-axis control of the spin qubit is achieved by applying a phase-tunable microwave modulation to the first gate. The demonstrated qubit functionality in a basic transistor-like device constitutes a promising step towards the elaboration of scalable spin qubit geometries in a readily exploitable CMOS platform. PMID:27882926

  6. A CMOS silicon spin qubit.

    PubMed

    Maurand, R; Jehl, X; Kotekar-Patil, D; Corna, A; Bohuslavskyi, H; Laviéville, R; Hutin, L; Barraud, S; Vinet, M; Sanquer, M; De Franceschi, S

    2016-11-24

    Silicon, the main constituent of microprocessor chips, is emerging as a promising material for the realization of future quantum processors. Leveraging its well-established complementary metal-oxide-semiconductor (CMOS) technology would be a clear asset to the development of scalable quantum computing architectures and to their co-integration with classical control hardware. Here we report a silicon quantum bit (qubit) device made with an industry-standard fabrication process. The device consists of a two-gate, p-type transistor with an undoped channel. At low temperature, the first gate defines a quantum dot encoding a hole spin qubit, the second one a quantum dot used for the qubit read-out. All electrical, two-axis control of the spin qubit is achieved by applying a phase-tunable microwave modulation to the first gate. The demonstrated qubit functionality in a basic transistor-like device constitutes a promising step towards the elaboration of scalable spin qubit geometries in a readily exploitable CMOS platform.

  7. Yield enhancement methodologies for 90-nm technology and beyond

    NASA Astrophysics Data System (ADS)

    Allgair, John; Carey, Todd; Dougan, James; Etnyre, Tony; Langdon, Nate; Murray, Brooke

    2006-03-01

    In order to stay competitive in the rapidly advancing international semiconductor industry, a manufacturing company needs to continually focus on several areas including rapid yield learning, manufacturing cost, statistical process control limits, process yield, equipment availability, cycle time, turns per direct labor hour, customer on time delivery and zero customer defects. To hold a competitive position in the semiconductor market, performance to these measurable factors mut be maintained regardless of the technology generation. In this presentation, the methodology applied by Freescale Semiconductor to achieve the fastest yield learning curve in the industry, as cited by Dr. Robert Leachman of UC Berkley in 2003, will be discussed.

  8. Nuclear magnetic resonance imaging with 90-nm resolution.

    PubMed

    Mamin, H J; Poggio, M; Degen, C L; Rugar, D

    2007-05-01

    Magnetic resonance imaging (MRI) is a powerful imaging technique that typically operates on the scale of millimetres to micrometres. Conventional MRI is based on the manipulation of nuclear spins with radio-frequency fields, and the subsequent detection of spins with induction-based techniques. An alternative approach, magnetic resonance force microscopy (MRFM), uses force detection to overcome the sensitivity limitations of conventional MRI. Here, we show that the two-dimensional imaging of nuclear spins can be extended to a spatial resolution better than 100 nm using MRFM. The imaging of 19F nuclei in a patterned CaF(2) test object was enabled by a detection sensitivity of roughly 1,200 nuclear spins at a temperature of 600 mK. To achieve this sensitivity, we developed high-moment magnetic tips that produced field gradients up to 1.4 x 10(6) T m(-1), and implemented a measurement protocol based on force-gradient detection of naturally occurring spin fluctuations. The resulting detection volume was less than 650 zeptolitres. This is 60,000 times smaller than the previous smallest volume for nuclear magnetic resonance microscopy, and demonstrates the feasibility of pushing MRI into the nanoscale regime.

  9. Accelerated life testing effects on CMOS microcircuit characteristics

    NASA Technical Reports Server (NTRS)

    1977-01-01

    Accelerated life tests were performed on CMOS microcircuits to predict their long term reliability. The consistency of the CMOS microcircuit activation energy between the range of 125 C to 200 C and the range 200 C to 250 C was determined. Results indicate CMOS complexity and the amount of moisture detected inside the devices after testing influences time to failure of tested CMOS devices.

  10. Carbon nanotube integration with a CMOS process.

    PubMed

    Perez, Maximiliano S; Lerner, Betiana; Resasco, Daniel E; Pareja Obregon, Pablo D; Julian, Pedro M; Mandolesi, Pablo S; Buffa, Fabian A; Boselli, Alfredo; Lamagna, Alberto

    2010-01-01

    This work shows the integration of a sensor based on carbon nanotubes using CMOS technology. A chip sensor (CS) was designed and manufactured using a 0.30 μm CMOS process, leaving a free window on the passivation layer that allowed the deposition of SWCNTs over the electrodes. We successfully investigated with the CS the effect of humidity and temperature on the electrical transport properties of SWCNTs. The possibility of a large scale integration of SWCNTs with CMOS process opens a new route in the design of more efficient, low cost sensors with high reproducibility in their manufacture.

  11. Spectrometry with consumer-quality CMOS cameras.

    PubMed

    Scheeline, Alexander

    2015-01-01

    Many modern spectrometric instruments use diode arrays, charge-coupled arrays, or CMOS cameras for detection and measurement. As portable or point-of-use instruments are desirable, one would expect that instruments using the cameras in cellular telephones and tablet computers would be the basis of numerous instruments. However, no mass market for such devices has yet developed. The difficulties in using megapixel CMOS cameras for scientific measurements are discussed, and promising avenues for instrument development reviewed. Inexpensive alternatives to use of the built-in camera are also mentioned, as the long-term question is whether it is better to overcome the constraints of CMOS cameras or to bypass them.

  12. Bridging faults in BiCMOS circuits

    NASA Technical Reports Server (NTRS)

    Menon, Sankaran M.; Malaiya, Yashwant K.; Jayasumana, Anura P.

    1993-01-01

    Combining the advantages of CMOS and bipolar, BiCMOS is emerging as a major technology for many high performance digital and mixed signal applications. Recent investigations revealed that bridging faults can be a major failure mode in IC's. Effects of bridging faults in BiCMOS circuits are presented. Bridging faults between logical units without feedback and logical units with feedback are considered. Several bridging faults can be detected by monitoring the power supply current (I(sub DDQ) monitoring). Effects of bridging faults and bridging resistance on output logic levels were examined along with their effects on noise immunity.

  13. Carbon Nanotube Integration with a CMOS Process

    PubMed Central

    Perez, Maximiliano S.; Lerner, Betiana; Resasco, Daniel E.; Pareja Obregon, Pablo D.; Julian, Pedro M.; Mandolesi, Pablo S.; Buffa, Fabian A.; Boselli, Alfredo; Lamagna, Alberto

    2010-01-01

    This work shows the integration of a sensor based on carbon nanotubes using CMOS technology. A chip sensor (CS) was designed and manufactured using a 0.30 μm CMOS process, leaving a free window on the passivation layer that allowed the deposition of SWCNTs over the electrodes. We successfully investigated with the CS the effect of humidity and temperature on the electrical transport properties of SWCNTs. The possibility of a large scale integration of SWCNTs with CMOS process opens a new route in the design of more efficient, low cost sensors with high reproducibility in their manufacture. PMID:22319330

  14. Nanopore-CMOS Interfaces for DNA Sequencing.

    PubMed

    Magierowski, Sebastian; Huang, Yiyun; Wang, Chengjie; Ghafar-Zadeh, Ebrahim

    2016-08-06

    DNA sequencers based on nanopore sensors present an opportunity for a significant break from the template-based incumbents of the last forty years. Key advantages ushered by nanopore technology include a simplified chemistry and the ability to interface to CMOS technology. The latter opportunity offers substantial promise for improvement in sequencing speed, size and cost. This paper reviews existing and emerging means of interfacing nanopores to CMOS technology with an emphasis on massively-arrayed structures. It presents this in the context of incumbent DNA sequencing techniques, reviews and quantifies nanopore characteristics and models and presents CMOS circuit methods for the amplification of low-current nanopore signals in such interfaces.

  15. A 0.5V Area-Efficient Transformer Folded-Cascode CMOS Low-Noise Amplifier

    NASA Astrophysics Data System (ADS)

    Kihara, Takao; Park, Hae-Ju; Takobe, Isao; Yamashita, Fumiaki; Matsuoka, Toshimasa; Taniguchi, Kenji

    A 0.5V transformer folded-cascode CMOS low-noise amplifier (LNA) is presented. The chip area of the LNA was reduced by coupling the internal inductor with the load inductor, and the effects of the magnetic coupling between these inductors were analyzed. The magnetic coupling reduces the resonance frequency of the input matching network, the peak frequency and magnitude of the gain, and the noise contributions from the common-gate stage to the LNA. A partially-coupled transformer with low magnetic coupling has a small effect on the LNA performance. The LNA with this transformer, fabricated in a 90nm digital CMOS process, achieved an S11 of -14dB, NF of 3.9dB, and voltage gain of 16.8dB at 4.7GHz with a power consumption of 1.0mW at a 0.5V supply. The chip area of the proposed LNA was 25% smaller than that of the conventional folded-cascode LNA.

  16. High photon detection efficiency single photon avalanche diode in 0.18 μm standard CMOS process

    NASA Astrophysics Data System (ADS)

    Wang, Wei; Bao, Xiaoyuan; Chen, Li; Chen, Ting; Wang, Guanyu; Yuan, Jun

    2017-06-01

    This paper proposed a single photon avalanche diodes (SPADs) designed with 0.18 μm standard CMOS process. One of the major challenges in CMOS SPADs is how to raise the low photon detection efficiency (PDE). In this paper, the device structure and process parameters of the CMOS SPAD are optimized so as to improve PDE properties which have been investigated in detail. The CMOS SPADs are designed in p+/n-well/deep n-well (DNW) structure with the p-sub and the p-well guard ring (GR). The simulation results show that with the p-well GR, the quantum efficiency (QE) is about 80% with the breakdown voltage of 12.7 V, the unit responsivity is as high as 0.38 A/W and the PDE of 51% and 53% is obtained when the excess bias is at 1 V and 2 V, respectively. The dark count rate (DCR) is 6.2 kHz when bias voltage is 14 V. With the p-sub GR, the breakdown voltage is 13 V, the unit responsivity is up to 0.26 A/W, the QE is 58%, the PDE is 33% and 37% at excess bias of 1 V and 2 V, respectively. The DCR is 3.4 kHz at reverse bias voltage of 14 V.

  17. Silicon-gate CMOS/SOS processing

    NASA Technical Reports Server (NTRS)

    Ramondetta, P.

    1979-01-01

    Major silicon-gate CMOS/SOS processes are described. Sapphire substrate preparation is also discussed, as well as the following process variations: (1) the double epi process; and (2) ion implantation.

  18. CMOS analog switches for adaptive filters

    NASA Technical Reports Server (NTRS)

    Dixon, C. E.

    1980-01-01

    Adaptive active low-pass filters incorporate CMOS (Complimentary Metal-Oxide Semiconductor) analog switches (such as 4066 switch) that reduce variation in switch resistance when filter is switched to any selected transfer function.

  19. Electroabsorption modulators for CMOS compatible optical interconnects in III-V and group IV materials

    NASA Astrophysics Data System (ADS)

    Roth, Jonathan Edgar

    While electrical systems excel at information processing, photonics is useful in systems for high-bandwidth, low-loss signal transmission. As photonics technology has become increasingly widespread and has been deployed at shorter distance scales than traditional long-haul networks, it has become important to efficiently integrate photonics components with electrical integrated circuits. Optoelectronic modulators used as transmitters are an important class of device for use in optical interconnects. Many optoelectronic modulator designs use waveguides. Coupling light into waveguides requires a difficult alignment step. This dissertation will describe a number of optoelectronic modulators that do not have the tight alignment constraints associated with waveguide-based modulators. The eased alignment constraints may be important for the practical manufacturing and packaging of systems using optical interconnects. Most currently deployed photonics technologies also use substrates other than silicon and materials incompatible with CMOS manufacturing. Recently we discovered a strong quantum-confined Stark effect in Ge/SiGe quantum well structures that can be used to create efficient optoelectronic modulators on silicon substrates. Optoelectronic modulators using this technology can be fabricated with conventional CMOS foundry processes, possibly on the same chips as CMOS circuits. In this dissertation, an optical interconnect operating in the C-band will be presented. We believe this is the first such device employing an optical transmitter flip-chip bonded to silicon CMOS. A number of novel modulators will be presented, which are fabricated on silicon substrates, and employ Ge/SiGe quantum well structures. These modulators include a novel architecture known as the side-entry modulator, which is designed for monolithic integration with electronics. One side-entry modulator achieved over 3 dB of contrast in the telecommunications C-band for a voltage swing of 1V. Such a

  20. Flexible packaging and integration of CMOS IC with elastomeric microfluidics

    NASA Astrophysics Data System (ADS)

    Zhang, Bowei; Dong, Quan; Korman, Can E.; Li, Zhenyu; Zaghloul, Mona E.

    2013-05-01

    We have demonstrated flexible packaging and integration of CMOS IC chips with PDMS microfluidics. Microfluidic channels are used to deliver both liquid samples and liquid metals to the CMOS die. The liquid metals are used to realize electrical interconnects to the CMOS chip. As a demonstration we integrated a CMOS magnetic sensor die and matched PDMS microfluidic channels in a flexible package. The packaged system is fully functional under 3cm bending radius. The flexible integration of CMOS ICs with microfluidics enables previously unavailable flexible CMOS electronic systems with fluidic manipulation capabilities, which hold great potential for wearable health monitoring, point-of-care diagnostics and environmental sensing.

  1. Fundamental study on identification of CMOS cameras

    NASA Astrophysics Data System (ADS)

    Kurosawa, Kenji; Saitoh, Naoki

    2003-08-01

    In this study, we discussed individual camera identification of CMOS cameras, because CMOS (complementary-metal-oxide-semiconductor) imaging detectors have begun to make their move into the CCD (charge-coupled-device) fields for recent years. It can be identified whether or not the given images have been taken with the given CMOS camera by detecting the imager's intrinsic unique fixed pattern noise (FPN) just like the individual CCD camera identification method proposed by the authors. Both dark and bright pictures taken with the CMOS cameras can be identified by the method, because not only dark current in the photo detectors but also MOS-FET amplifiers incorporated in each pixel may produce pixel-to-pixel nonuniformity in sensitivity. Each pixel in CMOS detectors has the amplifier, which degrades image quality of bright images due to the nonuniformity of the amplifier gain. Two CMOS cameras were evaluated in our experiments. They were WebCamGoPlus (Creative), and EOS D30 (Canon). WebCamGoPlus is a low-priced web camera, whereas EOS D30 is for professional use. Image of a white plate were recorded with the cameras under the plate's luminance condition of 0cd/m2 and 150cd/m2. The recorded images were multiply integrated to reduce the random noise component. From the images of both cameras, characteristic dots patterns were observed. Some bright dots were observed in the dark images, whereas some dark dots were in the bright images. The results show that the camera identification method is also effective for CMOS cameras.

  2. New package for CMOS sensors

    NASA Astrophysics Data System (ADS)

    Diot, Jean-Luc; Loo, Kum Weng; Moscicki, Jean-Pierre; Ng, Hun Shen; Tee, Tong Yan; Teysseyre, Jerome; Yap, Daniel

    2004-02-01

    Cost is the main drawback of existing packages for C-MOS sensors (mainly CLCC family). Alternative packages are thus developed world-wide. And in particular, S.T.Microelectronics has studied a low cost alternative packages based on QFN structure, still with a cavity. Intensive work was done to optimize the over-molding operation forming the cavity onto a metallic lead-frame (metallic lead-frame is a low cost substrate allowing very good mechanical definition of the final package). Material selection (thermo-set resin and glue for glass sealing) was done through standard reliability tests for cavity packages (Moisture Sensitivity Level 3 followed by temperature cycling, humidity storage and high temperature storage). As this package concept is new (without leads protruding the molded cavity), the effect of variation of package dimensions, as well as board lay-out design, are simulated on package life time (during temperature cycling, thermal mismatch between board and package leads to thermal fatigue of solder joints). These simulations are correlated with an experimental temperature cycling test with daisy-chain packages.

  3. Optical waveguide taps on silicon CMOS circuits

    NASA Astrophysics Data System (ADS)

    Stenger, Vincent E.; Beyette, Fred R., Jr.

    2000-11-01

    As silicon CMOS circuit technology is scaled beyond the GHz range, both chipmakers and board makers face increasingly difficult challenges in implementing high speed metal interconnects. Metal traces are limited in density-speed performance due to the skin effect, electrical conductivity, and cross talk. Optical based interconnects have higher available bandwidth by virtue of the extremely high carrier frequencies of optical signals (> 100 THz). For this work, an effort has been made to determine an optimal optical tap receiver design for integration with commercial CMOS processes. Candidate waveguide tap technologies were considered in terms of optical loss, bandwidth, economy, and CMOS process compatibility. A new device, which is based on a variation of the multimode interference effect, has been found to be especially promising. BeamProp simulation results show nearly zero excess optical loss for the design, and up to 70% coupling into a 25 micrometer traveling wave CMOS photodetector device. Single-mode waveguides make the design readily compatible with wavelength multiplexing/demultiplexing elements. Polymer waveguide materials are targeted for fabrication due to planarization properties, low cost, broad index control, and poling abilities for modulation/tuning functions. Low cost, silicon CMOS based processing makes the new tap technology especially suitable for computer chip and board level interconnects, as well as metro fiber-to-the- home/desk telecommunications applications.

  4. Wavelength dependence of silicon avalanche photodiode fabricated by CMOS process

    NASA Astrophysics Data System (ADS)

    Mohammed Napiah, Zul Atfyi Fauzan; Hishiki, Takuya; Iiyama, Koichi

    2017-07-01

    Avalanche photodiodes fabricated by CMOS process (CMOS-APDs) have features of high avalanche gain below 10 V, wide bandwidth over 5 GHz, and easy integration with electronic circuits. In CMOS-APDs, guard ring structure is introduced for high-speed operation by canceling photo-generated carriers in the substrate at the sacrifice of the responsivity. We describe here wavelength dependence of the responsivity and the bandwidth of the CMOS-APDs with shorted and opened guard ring structure.

  5. Experiments with synchronized sCMOS cameras

    NASA Astrophysics Data System (ADS)

    Steele, Iain A.; Jermak, Helen; Copperwheat, Chris M.; Smith, Robert J.; Poshyachinda, Saran; Soonthorntham, Boonrucksar

    2016-07-01

    Scientific-CMOS (sCMOS) cameras can combine low noise with high readout speeds and do not suffer the charge multiplication noise that effectively reduces the quantum efficiency of electron multiplying CCDs by a factor 2. As such they have strong potential in fast photometry and polarimetry instrumentation. In this paper we describe the results of laboratory experiments using a pair of commercial off the shelf sCMOS cameras based around a 4 transistor per pixel architecture. In particular using a both stable and a pulsed light sources we evaluate the timing precision that may be obtained when the cameras readouts are synchronized either in software or electronically. We find that software synchronization can introduce an error of 200-msec. With electronic synchronization any error is below the limit ( 50-msec) of our simple measurement technique.

  6. CMOS detectors at Rome "Tor Vergata" University

    NASA Astrophysics Data System (ADS)

    Berrilli, F.; Cantarano, S.; Egidi, A.; Giordano, S.

    The new class of CMOS panoramic detectors represents an innovative tool for the experimental astronomy of the forthcoming years. While current charge-coupled device (CCD) technology can produce nearly ideal detectors for astronomical use, the scientific quality CMOS detectors made today have characteristics similar to those of CCD devices but a simpler electronics and a reduced cost. Moreover, the high frame rate capability and the amplification of each pixel - active pixel - in a CMOS detector, allows the implementation of a specific data management. So, it is possible to design cameras with very high dynamic range suitable for the imaging of solar active regions. In fact, in such regions, the onset of a flare can produce problems of saturation in a CCD-based camera. In this work we present the preliminary result obtained with the Tor Vergata C-Cam APS camera used at the University Solar Station.

  7. Nanopore-CMOS Interfaces for DNA Sequencing

    PubMed Central

    Magierowski, Sebastian; Huang, Yiyun; Wang, Chengjie; Ghafar-Zadeh, Ebrahim

    2016-01-01

    DNA sequencers based on nanopore sensors present an opportunity for a significant break from the template-based incumbents of the last forty years. Key advantages ushered by nanopore technology include a simplified chemistry and the ability to interface to CMOS technology. The latter opportunity offers substantial promise for improvement in sequencing speed, size and cost. This paper reviews existing and emerging means of interfacing nanopores to CMOS technology with an emphasis on massively-arrayed structures. It presents this in the context of incumbent DNA sequencing techniques, reviews and quantifies nanopore characteristics and models and presents CMOS circuit methods for the amplification of low-current nanopore signals in such interfaces. PMID:27509529

  8. High-temperature Complementary Metal Oxide Semiconductors (CMOS)

    NASA Technical Reports Server (NTRS)

    Mcbrayer, J. D.

    1981-01-01

    The results of an investigation into the possibility of using complementary metal oxide semiconductor (CMOS) technology for high temperature electronics are presented. A CMOS test chip was specifically developed as the test bed. This test chip incorporates CMOS transistors that have no gate protection diodes; these diodes are the major cause of leakage in commercial devices.

  9. Low power, CMOS digital autocorrelator spectrometer for spaceborne applications

    NASA Technical Reports Server (NTRS)

    Chandra, Kumar; Wilson, William J.

    1992-01-01

    A 128-channel digital autocorrelator spectrometer using four 32 channel low power CMOS correlator chips was built and tested. The CMOS correlator chip uses a 2-bit multiplication algorithm and a full-custom CMOS VLSI design to achieve low DC power consumption. The digital autocorrelator spectrometer has a 20 MHz band width, and the total DC power requirement is 6 Watts.

  10. Resistor Extends Life Of Battery In Clocked CMOS Circuit

    NASA Technical Reports Server (NTRS)

    Wells, George H., Jr.

    1991-01-01

    Addition of fixed resistor between battery and clocked complementary metal oxide/semiconductor (CMOS) circuit reduces current drawn from battery. Basic idea to minimize current drawn from battery by operating CMOS circuit at lowest possible current consistent with use of simple, fixed off-the-shelf components. Prolongs lives of batteries in such low-power CMOS circuits as watches and calculators.

  11. End-of-fabrication CMOS process monitor

    NASA Technical Reports Server (NTRS)

    Buehler, M. G.; Allen, R. A.; Blaes, B. R.; Hannaman, D. J.; Lieneweg, U.; Lin, Y.-S.; Sayah, H. R.

    1990-01-01

    A set of test 'modules' for verifying the quality of a complementary metal oxide semiconductor (CMOS) process at the end of the wafer fabrication is documented. By electrical testing of specific structures, over thirty parameters are collected characterizing interconnects, dielectrics, contacts, transistors, and inverters. Each test module contains a specification of its purpose, the layout of the test structure, the test procedures, the data reduction algorithms, and exemplary results obtained from 3-, 2-, or 1.6-micrometer CMOS/bulk processes. The document is intended to establish standard process qualification procedures for Application Specific Integrated Circuits (ASIC's).

  12. CMOS sensor for face tracking and recognition

    NASA Astrophysics Data System (ADS)

    Ginhac, Dominique; Prasetyo, Eri; Paindavoine, Michel

    2005-03-01

    This paper describes the main principles of a vision sensor dedicated to the detecting and tracking faces in video sequences. For this purpose, a current mode CMOS active sensor has been designed using an array of pixels that are amplified by using current mirrors of column amplifier. This circuit is simulated using Mentor Graphics software with parameters of a 0.6 μm CMOS process. The circuit design is added with a sequential control unit which purpose is to realise capture of subwindows at any location and any size in the whole image.

  13. Optical addressing technique for a CMOS RAM

    NASA Technical Reports Server (NTRS)

    Wu, W. H.; Bergman, L. A.; Allen, R. A.; Johnston, A. R.

    1988-01-01

    Progress on optically addressing a CMOS RAM for a feasibility demonstration of free space optical interconnection is reported in this paper. The optical RAM chip has been fabricated and functional testing is in progress. Initial results seem promising. New design and SPICE simulation of optical gate cell (OGC) circuits have been carried out to correct the slow fall time of the 'weak pull down' OGC, which has been characterized experimentally. Methods of reducing the response times of the photodiodes and the associated circuits are discussed. Even with the current photodiode, it appears that an OGC can be designed with a performance that is compatible with a CMOS circuit such as the RAM.

  14. Flip-chip integrated silicon Mach-Zehnder modulator with a 28nm fully depleted silicon-on-insulator CMOS driver.

    PubMed

    Yong, Zheng; Shopov, Stefan; Mikkelsen, Jared C; Mallard, Robert; Mak, Jason C C; Voinigescu, Sorin P; Poon, Joyce K S

    2017-03-20

    We present a silicon electro-optic transmitter consisting of a 28nm ultra-thin body and buried oxide fully depleted silicon-on-insulator (UTBB FD-SOI) CMOS driver flip-chip integrated onto a Mach-Zehnder modulator. The Mach-Zehnder silicon optical modulator was optimized to have a 3dB bandwidth of around 25 GHz at -1V bias and a 50 Ω impedance. The UTBB FD-SOI CMOS driver provided a large output voltage swing around 5 Vpp to enable a high dynamic extinction ratio and a low device insertion loss. At 44 Gbps, the transmitter achieved a high extinction ratio of 6.4 dB at the modulator quadrature operation point. This result shows open eye diagrams at the highest bit rates and with the largest extinction ratios for silicon electro-optic transmitter using a CMOS driver.

  15. CMOS and sCMOS imaging performance comparison by digital holographic interferometry

    NASA Astrophysics Data System (ADS)

    Flores-Moreno, Jorge Mauricio; De la Torre Ibarra, Manuel H.; del Socorro Hernández-Montes, María; Perez Lopez, Carlos; Santoyo, Fernando Mendoza

    2016-12-01

    We use a digital holographic interferometric setup to assess, as a proof of concept, two state-of-the-art sensors (CMOS and sCMOS cameras) that are widely used in nondestructive testing (NDT). This interferometric study is intended to evaluate the image quality recorded by any camera used in NDT. The assessing relies on the quantification of the optical phase information recovered by the cameras used for this study. For this, we calculate the signal-to-noise ratio, correlation coefficient, and quality index (Q-index) as main figures-of-merit. As far as we know, the Q-index has not been used for evaluation of the optical phase coming from image holograms. The CMOS and sCMOS sensors used record the same deformation event under the same experimental conditions. The experiment involves the inspection of a large sample (>1 m2 of area) which implies low illumination conditions for the imaging sensors. The retrieved CMOS optical phase shows artifacts that are not observed in the sCMOS. An analysis of these two groups of interferometric images is presented and discussed. The methodology set forth here can be applied to evaluate other sensors such as CCDs and EM-CCDs.

  16. On the integration of ultrananocrystalline diamond (UNCD) with CMOS chip

    DOE PAGES

    Mi, Hongyi; Yuan, Hao -Chih; Seo, Jung -Hun; ...

    2017-03-27

    A low temperature deposition of high quality ultrananocrystalline diamond (UNCD) film onto a finished Si-based CMOS chip was performed to investigate the compatibility of the UNCD deposition process with CMOS devices for monolithic integration of MEMS on Si CMOS platform. DC and radio-frequency performances of the individual PMOS and NMOS devices on the CMOS chip before and after the UNCD deposition were characterized. Electrical characteristics of CMOS after deposition of the UNCD film remained within the acceptable ranges, namely showing small variations in threshold voltage Vth, transconductance gm, cut-off frequency fT and maximum oscillation frequency fmax. Finally, the results suggestmore » that low temperature UNCD deposition is compatible with CMOS to realize monolithically integrated CMOS-driven MEMS/NEMS based on UNCD.« less

  17. Design and realization of CMOS image sensor

    NASA Astrophysics Data System (ADS)

    Xu, Jian; Xiao, Zexin

    2008-02-01

    A project was presented that instrumental design of an economical CMOS microscope image sensor. A high performance, low price, black-white camera chip OV5116P was used as the core of the sensor circuit; Designing and realizing peripheral control circuit of sensor; Through the control on dial switch to realize different functions of the sensor chip in the system. For example: auto brightness level descending function on or off; gamma correction function on or off; auto and manual backlight compensation mode conversion and so on. The optical interface of sensor is designed for commercialization and standardization. The images of sample were respectively gathered with CCD and CMOS. Result of the experiment indicates that both performances were identical in several aspects as follows: image definition, contrast control, heating degree and the function can be adjusted according to the demand of user etc. The imperfection was that the CMOS with smaller field and higher noise than CCD; nevertheless, the maximal advantage of choosing the CMOS chip is its low cost. And its imaging quality conformed to requirement of the economical microscope image sensor.

  18. A Hybrid CMOS-Memristor Neuromorphic Synapse.

    PubMed

    Azghadi, Mostafa Rahimi; Linares-Barranco, Bernabe; Abbott, Derek; Leong, Philip H W

    2017-04-01

    Although data processing technology continues to advance at an astonishing rate, computers with brain-like processing capabilities still elude us. It is envisioned that such computers may be achieved by the fusion of neuroscience and nano-electronics to realize a brain-inspired platform. This paper proposes a high-performance nano-scale Complementary Metal Oxide Semiconductor (CMOS)-memristive circuit, which mimics a number of essential learning properties of biological synapses. The proposed synaptic circuit that is composed of memristors and CMOS transistors, alters its memristance in response to timing differences among its pre- and post-synaptic action potentials, giving rise to a family of Spike Timing Dependent Plasticity (STDP). The presented design advances preceding memristive synapse designs with regards to the ability to replicate essential behaviours characterised in a number of electrophysiological experiments performed in the animal brain, which involve higher order spike interactions. Furthermore, the proposed hybrid device CMOS area is estimated as [Formula: see text] in a [Formula: see text] process-this represents a factor of ten reduction in area with respect to prior CMOS art. The new design is integrated with silicon neurons in a crossbar array structure amenable to large-scale neuromorphic architectures and may pave the way for future neuromorphic systems with spike timing-dependent learning features. These systems are emerging for deployment in various applications ranging from basic neuroscience research, to pattern recognition, to Brain-Machine-Interfaces.

  19. Fully CMOS-compatible titanium nitride nanoantennas

    SciTech Connect

    Briggs, Justin A.; Naik, Gururaj V.; Baum, Brian K.; Dionne, Jennifer A.; Petach, Trevor A.; Goldhaber-Gordon, David

    2016-02-01

    CMOS-compatible fabrication of plasmonic materials and devices will accelerate the development of integrated nanophotonics for information processing applications. Using low-temperature plasma-enhanced atomic layer deposition (PEALD), we develop a recipe for fully CMOS-compatible titanium nitride (TiN) that is plasmonic in the visible and near infrared. Films are grown on silicon, silicon dioxide, and epitaxially on magnesium oxide substrates. By optimizing the plasma exposure per growth cycle during PEALD, carbon and oxygen contamination are reduced, lowering undesirable loss. We use electron beam lithography to pattern TiN nanopillars with varying diameters on silicon in large-area arrays. In the first reported single-particle measurements on plasmonic TiN, we demonstrate size-tunable darkfield scattering spectroscopy in the visible and near infrared regimes. The optical properties of this CMOS-compatible material, combined with its high melting temperature and mechanical durability, comprise a step towards fully CMOS-integrated nanophotonic information processing.

  20. Low energy CMOS for space applications

    NASA Technical Reports Server (NTRS)

    Panwar, Ramesh; Alkalaj, Leon

    1992-01-01

    The current focus of NASA's space flight programs reflects a new thrust towards smaller, less costly, and more frequent space missions, when compared to missions such as Galileo, Magellan, or Cassini. Recently, the concept of a microspacecraft was proposed. In this concept, a small, compact spacecraft that weighs tens of kilograms performs focused scientific objectives such as imaging. Similarly, a Mars Lander micro-rover project is under study that will allow miniature robots weighing less than seven kilograms to explore the Martian surface. To bring the microspacecraft and microrover ideas to fruition, one will have to leverage compact 3D multi-chip module-based multiprocessors (MCM) technologies. Low energy CMOS will become increasingly important because of the thermodynamic considerations in cooling compact 3D MCM implementations and also from considerations of the power budget for space applications. In this paper, we show how the operating voltage is related to the threshold voltage of the CMOS transistors for accomplishing a task in VLSI with minimal energy. We also derive expressions for the noise margins at the optimal operating point. We then look at a low voltage CMOS (LVCMOS) technology developed at Stanford University which improves the power consumption over conventional CMOS by a couple of orders of magnitude and consider the suitability of the technology for space applications by characterizing its SEU immunity.

  1. Low power SEU immune CMOS memory circuits

    NASA Technical Reports Server (NTRS)

    Liu, M. N.; Whitaker, Sterling

    1992-01-01

    The authors report a design improvement for CMOS static memory circuits hardened against single event upset (SEU) using a recently proposed logic/circuit design technique. This improvement drastically reduces static power consumption, reduces the number of transistors required in a D flip-flop design, and eliminates the possibility of capturing an upset state in the slave section during a clock transition.

  2. SEU hardening of CMOS memory circuit

    NASA Technical Reports Server (NTRS)

    Whitaker, S.; Canaris, J.; Liu, K.

    1990-01-01

    This paper reports a design technique to harden CMOS memory circuits against Single Event Upset (SEU) in the space environment. A RAM cell and Flip Flop design are presented to demonstrate the method. The Flip Flop was used in the control circuitry for a Reed Solomon encoder designed for the Space Station.

  3. Improving CMOS-compatible Germanium photodetectors.

    PubMed

    Li, Guoliang; Luo, Ying; Zheng, Xuezhe; Masini, Gianlorenzo; Mekis, Attila; Sahni, Subal; Thacker, Hiren; Yao, Jin; Shubin, Ivan; Raj, Kannan; Cunningham, John E; Krishnamoorthy, Ashok V

    2012-11-19

    We report design improvements for evanescently coupled Germanium photodetectors grown at low temperature. The resulting photodetectors with 10 μm Ge length manufactured in a commercial CMOS process achieve >0.8 A/W responsivity over the entire C-band, with a device capacitance of <7 fF based on measured data.

  4. A fail-safe CMOS logic gate

    NASA Technical Reports Server (NTRS)

    Bobin, V.; Whitaker, S.

    1990-01-01

    This paper reports a design technique to make Complex CMOS Gates fail-safe for a class of faults. Two classes of faults are defined. The fail-safe design presented has limited fault-tolerance capability. Multiple faults are also covered.

  5. Radiation Tolerance of 65nm CMOS Transistors

    DOE PAGES

    Krohn, M.; Bentele, B.; Christian, D. C.; ...

    2015-12-11

    We report on the effects of ionizing radiation on 65 nm CMOS transistors held at approximately -20°C during irradiation. The pattern of damage observed after a total dose of 1 Grad is similar to damage reported in room temperature exposures, but we observe less damage than was observed at room temperature.

  6. CMOS preamplifiers for detectors large and small

    SciTech Connect

    O`Connor, P.

    1997-12-31

    We describe four CMOS preamplifiers developed for multiwire proportional chambers (MWPC) and silicon drift detectors (SDD) covering a capacitance range from 150 pF to 0.15 pF. Circuit techniques to optimize noise performance, particularly in the low-capacitance regime, are discussed.

  7. Low-Power SOI CMOS Transceiver

    NASA Technical Reports Server (NTRS)

    Fujikawa, Gene (Technical Monitor); Cheruiyot, K.; Cothern, J.; Huang, D.; Singh, S.; Zencir, E.; Dogan, N.

    2003-01-01

    The work aims at developing a low-power Silicon on Insulator Complementary Metal Oxide Semiconductor (SOI CMOS) Transceiver for deep-space communications. RF Receiver must accomplish the following tasks: (a) Select the desired radio channel and reject other radio signals, (b) Amplify the desired radio signal and translate them back to baseband, and (c) Detect and decode the information with Low BER. In order to minimize cost and achieve high level of integration, receiver architecture should use least number of external filters and passive components. It should also consume least amount of power to minimize battery cost, size, and weight. One of the most stringent requirements for deep-space communication is the low-power operation. Our study identified that two candidate architectures listed in the following meet these requirements: (1) Low-IF receiver, (2) Sub-sampling receiver. The low-IF receiver uses minimum number of external components. Compared to Zero-IF (Direct conversion) architecture, it has less severe offset and flicker noise problems. The Sub-sampling receiver amplifies the RF signal and samples it using track-and-hold Subsampling mixer. These architectures provide low-power solution for the short- range communications missions on Mars. Accomplishments to date include: (1) System-level design and simulation of a Double-Differential PSK receiver, (2) Implementation of Honeywell SOI CMOS process design kit (PDK) in Cadence design tools, (3) Design of test circuits to investigate relationships between layout techniques, geometry, and low-frequency noise in SOI CMOS, (4) Model development and verification of on-chip spiral inductors in SOI CMOS process, (5) Design/implementation of low-power low-noise amplifier (LNA) and mixer for low-IF receiver, and (6) Design/implementation of high-gain LNA for sub-sampling receiver. Our initial results show that substantial improvement in power consumption is achieved using SOI CMOS as compared to standard CMOS

  8. CMOS-compatible spintronic devices: a review

    NASA Astrophysics Data System (ADS)

    Makarov, Alexander; Windbacher, Thomas; Sverdlov, Viktor; Selberherr, Siegfried

    2016-11-01

    For many decades CMOS devices have been successfully scaled down to achieve higher speed and increased performance of integrated circuits at lower cost. Today’s charge-based CMOS electronics encounters two major challenges: power dissipation and variability. Spintronics is a rapidly evolving research and development field, which offers a potential solution to these issues by introducing novel ‘more than Moore’ devices. Spin-based magnetoresistive random-access memory (MRAM) is already recognized as one of the most promising candidates for future universal memory. Magnetic tunnel junctions, the main elements of MRAM cells, can also be used to build logic-in-memory circuits with non-volatile storage elements on top of CMOS logic circuits, as well as versatile compact on-chip oscillators with low power consumption. We give an overview of CMOS-compatible spintronics applications. First, we present a brief introduction to the physical background considering such effects as magnetoresistance, spin-transfer torque (STT), spin Hall effect, and magnetoelectric effects. We continue with a comprehensive review of the state-of-the-art spintronic devices for memory applications (STT-MRAM, domain wall-motion MRAM, and spin-orbit torque MRAM), oscillators (spin torque oscillators and spin Hall nano-oscillators), logic (logic-in-memory, all-spin logic, and buffered magnetic logic gate grid), sensors, and random number generators. Devices with different types of resistivity switching are analyzed and compared, with their advantages highlighted and challenges revealed. CMOS-compatible spintronic devices are demonstrated beginning with predictive simulations, proceeding to their experimental confirmation and realization, and finalized by the current status of application in modern integrated systems and circuits. We conclude the review with an outlook, where we share our vision on the future applications of the prospective devices in the area.

  9. Graphene/Si CMOS Hybrid Hall Integrated Circuits

    NASA Astrophysics Data System (ADS)

    Huang, Le; Xu, Huilong; Zhang, Zhiyong; Chen, Chengying; Jiang, Jianhua; Ma, Xiaomeng; Chen, Bingyan; Li, Zishen; Zhong, Hua; Peng, Lian-Mao

    2014-07-01

    Graphene/silicon CMOS hybrid integrated circuits (ICs) should provide powerful functions which combines the ultra-high carrier mobility of graphene and the sophisticated functions of silicon CMOS ICs. But it is difficult to integrate these two kinds of heterogeneous devices on a single chip. In this work a low temperature process is developed for integrating graphene devices onto silicon CMOS ICs for the first time, and a high performance graphene/CMOS hybrid Hall IC is demonstrated. Signal amplifying/process ICs are manufactured via commercial 0.18 um silicon CMOS technology, and graphene Hall elements (GHEs) are fabricated on top of the passivation layer of the CMOS chip via a low-temperature micro-fabrication process. The sensitivity of the GHE on CMOS chip is further improved by integrating the GHE with the CMOS amplifier on the Si chip. This work not only paves the way to fabricate graphene/Si CMOS Hall ICs with much higher performance than that of conventional Hall ICs, but also provides a general method for scalable integration of graphene devices with silicon CMOS ICs via a low-temperature process.

  10. Graphene/Si CMOS hybrid hall integrated circuits.

    PubMed

    Huang, Le; Xu, Huilong; Zhang, Zhiyong; Chen, Chengying; Jiang, Jianhua; Ma, Xiaomeng; Chen, Bingyan; Li, Zishen; Zhong, Hua; Peng, Lian-Mao

    2014-07-07

    Graphene/silicon CMOS hybrid integrated circuits (ICs) should provide powerful functions which combines the ultra-high carrier mobility of graphene and the sophisticated functions of silicon CMOS ICs. But it is difficult to integrate these two kinds of heterogeneous devices on a single chip. In this work a low temperature process is developed for integrating graphene devices onto silicon CMOS ICs for the first time, and a high performance graphene/CMOS hybrid Hall IC is demonstrated. Signal amplifying/process ICs are manufactured via commercial 0.18 um silicon CMOS technology, and graphene Hall elements (GHEs) are fabricated on top of the passivation layer of the CMOS chip via a low-temperature micro-fabrication process. The sensitivity of the GHE on CMOS chip is further improved by integrating the GHE with the CMOS amplifier on the Si chip. This work not only paves the way to fabricate graphene/Si CMOS Hall ICs with much higher performance than that of conventional Hall ICs, but also provides a general method for scalable integration of graphene devices with silicon CMOS ICs via a low-temperature process.

  11. SOI-CMOS-MEMS electrothermal micromirror arrays

    NASA Astrophysics Data System (ADS)

    Gilgunn, Peter J.

    A fabrication technology called SOI-CMOS-MEMS is developed to realize arrays of electrothermally actuated micromirror arrays with fill factors up to 90% and mechanical scan ranges up to +/-45°. SOI-CMOS-MEMS features bonding of a CMOS-MEMS folded electrothermal actuator chip with a SOI mirror chip. Actuators and micromirrors are separately released using Bosch-type and isotropic Si etch processes. A 1-D, 3 x 3 SOI-CMOS-MEMS mirror array is characterized at a 1 mm scale that meets fill factor and scan range targets with a power sensitivity of 1.9 deg·m W-1 and -0.9 deg·m W-1 on inner and outer actuator legs, respectively. Issues preventing fabrication of SOI-CMOS-MEMS micromirror arrays designed for 1-D and 3-D motion at scales from 500 microm to 50 microm are discussed. Electrothermomechanical analytic models of power response of a generic folded actuator topology are developed that provide insight into the trends in actuator behavior for actuator design elements such as beam geometry and heater type, among others. Adverse power and scan range scaling and favorable speed scaling are demonstrated. Mechanical constraints on device geometry are derived. Detailed material, process, test structure and device characterization is presented that demonstrates the consistency of measured device behavior with analytic models. A unified model for aspect ratio dependent etch modulation is developed that achieves depth prediction accuracy of better than 10% up to 160 microm depth over a range of feature shapes and dimensions. The technique is applied extensively in the SOI-CMOS-MEMS process to produce deep multi-level structures in Si with a single etch mask and to control uniformity and feature profiles. TiW attack during release etch is shown to be the driving factor in mirror coplanarity loss. The effect is due to thermally accelerated etching caused by heating of released structures by the exothermic reaction of Si and F. The effect is quantified using in situ infrared

  12. Post-CMOS selective electroplating technique for the improvement of CMOS-MEMS accelerometers

    NASA Astrophysics Data System (ADS)

    Liu, Yu-Chia; Tsai, Ming-Han; Tang, Tsung-Lin; Fang, Weileun

    2011-10-01

    This study presents a simple approach to improve the performance of the CMOS-MEMS capacitive accelerometer by means of the post-CMOS metal electroplating process. The metal layer can be selectively electroplated on the MEMS structures at low temperature and the thickness of the metal layer can be easily adjusted by this process. Thus the performance of the capacitive accelerometer (i.e. sensitivity, noise floor and the minimum detectable signal) can be improved. In application, the proposed accelerometers have been implemented using (1) the standard CMOS 0.35 µm 2P4M process by CMOS foundry, (2) Ti/Au seed layers deposition/patterning by MEMS foundry and (3) in-house post-CMOS electroplating and releasing processes. Measurements indicate that the sensitivity is improved 2.85-fold, noise is decreased near 1.7-fold and the minimum detectable signal is improved from 1 to 0.2 G after nickel electroplating. Moreover, unwanted structure deformation due to the temperature variation is significantly suppressed by electroplated nickel.

  13. All-Digital Time-Domain CMOS Smart Temperature Sensor with On-Chip Linearity Enhancement.

    PubMed

    Chen, Chun-Chi; Chen, Chao-Lieh; Lin, Yi

    2016-01-30

    This paper proposes the first all-digital on-chip linearity enhancement technique for improving the accuracy of the time-domain complementary metal-oxide semiconductor (CMOS) smart temperature sensor. To facilitate on-chip application and intellectual property reuse, an all-digital time-domain smart temperature sensor was implemented using 90 nm Field Programmable Gate Arrays (FPGAs). Although the inverter-based temperature sensor has a smaller circuit area and lower complexity, two-point calibration must be used to achieve an acceptable inaccuracy. With the help of a calibration circuit, the influence of process variations was reduced greatly for one-point calibration support, reducing the test costs and time. However, the sensor response still exhibited a large curvature, which substantially affected the accuracy of the sensor. Thus, an on-chip linearity-enhanced circuit is proposed to linearize the curve and achieve a new linearity-enhanced output. The sensor was implemented on eight different Xilinx FPGA using 118 slices per sensor in each FPGA to demonstrate the benefits of the linearization. Compared with the unlinearized version, the maximal inaccuracy of the linearized version decreased from 5 °C to 2.5 °C after one-point calibration in a range of -20 °C to 100 °C. The sensor consumed 95 μW using 1 kSa/s. The proposed linearity enhancement technique significantly improves temperature sensing accuracy, avoiding costly curvature compensation while it is fully synthesizable for future Very Large Scale Integration (VLSI) system.

  14. All-Digital Time-Domain CMOS Smart Temperature Sensor with On-Chip Linearity Enhancement

    PubMed Central

    Chen, Chun-Chi; Chen, Chao-Lieh; Lin, Yi

    2016-01-01

    This paper proposes the first all-digital on-chip linearity enhancement technique for improving the accuracy of the time-domain complementary metal-oxide semiconductor (CMOS) smart temperature sensor. To facilitate on-chip application and intellectual property reuse, an all-digital time-domain smart temperature sensor was implemented using 90 nm Field Programmable Gate Arrays (FPGAs). Although the inverter-based temperature sensor has a smaller circuit area and lower complexity, two-point calibration must be used to achieve an acceptable inaccuracy. With the help of a calibration circuit, the influence of process variations was reduced greatly for one-point calibration support, reducing the test costs and time. However, the sensor response still exhibited a large curvature, which substantially affected the accuracy of the sensor. Thus, an on-chip linearity-enhanced circuit is proposed to linearize the curve and achieve a new linearity-enhanced output. The sensor was implemented on eight different Xilinx FPGA using 118 slices per sensor in each FPGA to demonstrate the benefits of the linearization. Compared with the unlinearized version, the maximal inaccuracy of the linearized version decreased from 5 °C to 2.5 °C after one-point calibration in a range of −20 °C to 100 °C. The sensor consumed 95 μW using 1 kSa/s. The proposed linearity enhancement technique significantly improves temperature sensing accuracy, avoiding costly curvature compensation while it is fully synthesizable for future Very Large Scale Integration (VLSI) system. PMID:26840316

  15. Cmos spdt switch for wlan applications

    NASA Astrophysics Data System (ADS)

    Bhuiyan, M. A. S.; Reaz, M. B. I.; Rahman, L. F.; Minhad, K. N.

    2015-04-01

    WLAN has become an essential part of our today's life. The advancement of CMOS technology let the researchers contribute low power, size and cost effective WLAN devices. This paper proposes a single pole double through transmit/receive (T/R) switch for WLAN applications in 0.13 μm CMOS technology. The proposed switch exhibit 1.36 dB insertion loss, 25.3 dB isolation and 24.3 dBm power handling capacity. Moreover, it only dissipates 786.7 nW power per cycle. The switch utilizes only transistor aspect ratio optimization and resistive body floating technique to achieve such desired performance. In this design the use of bulky inductor and capacitor is avoided to evade imposition of unwanted nonlinearities to the communication signal.

  16. Submicrometer polysilicon gate CMOS/SOS technology

    NASA Astrophysics Data System (ADS)

    Ipri, A. C.; Sokoloski, J. C.; Flatley, D. W.

    1980-07-01

    A process is described for the fabrication of CMOS/SOS submicrometer devices and integrated circuits. The process utilizes the lateral diffusion of boron into polycrystalline silicon and a subsequent anisotropic etchant to define the narrow poly gates. Devices with channel lengths as small as 0.3 micron have been fabricated and characterized. Both avalanche and tunnel injection of carriers into the gate dielectric have been measured and both can have an impact on the limit of voltage operation. At present, these mechanisms appear to place an upper limit of about 8 V on the operating voltage of dynamic circuits containing 0.5-micron channel length devices. The propagation delay of 0.5-micron channel length CMOS/SOS inverters is about 200 ps at 5 V and dynamic binary counters will operate with a maximum input frequency of 550 MHz and 8 V while dissipating 130 mW.

  17. Ultralow-Loss CMOS Copper Plasmonic Waveguides.

    PubMed

    Fedyanin, Dmitry Yu; Yakubovsky, Dmitry I; Kirtaev, Roman V; Volkov, Valentyn S

    2016-01-13

    Surface plasmon polaritons can give a unique opportunity to manipulate light at a scale well below the diffraction limit reducing the size of optical components down to that of nanoelectronic circuits. At the same time, plasmonics is mostly based on noble metals, which are not compatible with microelectronics manufacturing technologies. This prevents plasmonic components from integration with both silicon photonics and silicon microelectronics. Here, we demonstrate ultralow-loss copper plasmonic waveguides fabricated in a simple complementary metal-oxide semiconductor (CMOS) compatible process, which can outperform gold plasmonic waveguides simultaneously providing long (>40 μm) propagation length and deep subwavelength (∼λ(2)/50, where λ is the free-space wavelength) mode confinement in the telecommunication spectral range. These results create the backbone for the development of a CMOS plasmonic platform and its integration in future electronic chips.

  18. Radiation effects on scientific CMOS image sensor

    NASA Astrophysics Data System (ADS)

    Yuanfu, Zhao; Liyan, Liu; Xiaohui, Liu; Xiaofeng, Jin; Xiang, Li

    2015-11-01

    A systemic solution for radiation hardened design is presented. Besides, a series of experiments have been carried out on the samples, and then the photoelectric response characteristic and spectral characteristic before and after the experiments have been comprehensively analyzed. The performance of the CMOS image sensor with the radiation hardened design technique realized total-dose resilience up to 300 krad(Si) and resilience to single-event latch up for LET up to 110 MeV·cm2/mg.

  19. Advanced CMOS Radiation Effects Testing and Analysis

    NASA Technical Reports Server (NTRS)

    Pellish, J. A.; Marshall, P. W.; Rodbell, K. P.; Gordon, M. S.; LaBel, K. A.; Schwank, J. R.; Dodds, N. A.; Castaneda, C. M.; Berg, M. D.; Kim, H. S.; hide

    2014-01-01

    Presentation at the annual NASA Electronic Parts and Packaging (NEPP) Program Electronic Technology Workshop (ETW). The material includes an update of progress in this NEPP task area over the past year, which includes testing, evaluation, and analysis of radiation effects data on the IBM 32 nm silicon-on-insulator (SOI) complementary metal oxide semiconductor (CMOS) process. The testing was conducted using test vehicles supplied by directly by IBM.

  20. CMOS-array design-automation techniques

    NASA Technical Reports Server (NTRS)

    Feller, A.; Lombardt, T.

    1979-01-01

    Thirty four page report discusses design of 4,096-bit complementary metal oxide semiconductor (CMOS) read-only memory (ROM). CMOSROM is either mask or laser programable. Report is divided into six sections; section one describes background of ROM chips; section two presents design goals for chip; section three discusses chip implementation and chip statistics; conclusions and recommendations are given in sections four thru six.

  1. CMOS-array design-automation techniques

    NASA Technical Reports Server (NTRS)

    Feller, A.; Lombardt, T.

    1979-01-01

    Thirty four page report discusses design of 4,096-bit complementary metal oxide semiconductor (CMOS) read-only memory (ROM). CMOSROM is either mask or laser programable. Report is divided into six sections; section one describes background of ROM chips; section two presents design goals for chip; section three discusses chip implementation and chip statistics; conclusions and recommendations are given in sections four thru six.

  2. CMOS Camera Array With Onboard Memory

    NASA Technical Reports Server (NTRS)

    Gat, Nahum

    2009-01-01

    A compact CMOS (complementary metal oxide semiconductor) camera system has been developed with high resolution (1.3 Megapixels), a USB (universal serial bus) 2.0 interface, and an onboard memory. Exposure times, and other operating parameters, are sent from a control PC via the USB port. Data from the camera can be received via the USB port and the interface allows for simple control and data capture through a laptop computer.

  3. CMOS-controlled rapidly tunable photodetectors

    NASA Astrophysics Data System (ADS)

    Chen, Ray

    With rapidly increasing data bandwidth demands, wavelength-division-multiplexing (WDM) optical access networks seem unavoidable in the near future. To operate WDM optical networks in an efficient scheme, wavelength reconfigurability and scalability of the network are crucial. Unfortunately, most of the existing wavelength tunable technologies are neither rapidly tunable nor spectrally programmable. This dissertation presents a tunable photodetector that is designed for dynamic-wavelength allocation WDM network environments. The wavelength tuning mechanism is completely different from existing technologies. The spectrum of this detector is programmable through low-voltage digital patterns. Since the wavelength selection is achieved by electronic means, the device wavelength reconfiguration time is as fast as the electronic switching time. In this dissertation work, we have demonstrated a tunable detector that is hybridly integrated with its customized CMOS driver and receiver with nanosecond wavelength reconfiguration time. In addition to its nanosecond wavelength reconfiguration time, the spectrum of this detector is digitally programmable, which means that it can adapt to system changes without re-fabrication. We have theoretically developed and experimentally demonstrated two device operating algorithms based on the same orthogonal device-optics basis. Both the rapid wavelength tuning time and the scalability make this novel device very viable for new reconfigurable WDM networks. By taking advantage of CMOS circuit design, this detector concept can be further extended for simultaneous multiple wavelength detection. We have developed one possible chip architecture and have designed a CMOS tunable optical demux for simultaneous controllable two-wavelength detection.

  4. A CMOS compatible, ferroelectric tunnel junction.

    PubMed

    Ambriz Vargas, Fabian; Kolhatkar, Gitanjali; Broyer, Maxime; Hadj Youssef, Azza; Nouar, Rafik; Sarkissian, Andranik; Thomas, Reji; Gomez-Yanez, Carlos; Gauthier, Marc A; Ruediger, Andreas

    2017-04-03

    In recent years, the experimental demonstration of Ferroelectric Tunnel Junctions (FTJ) based on perovskite tunnel barriers has been reported. However, integrating these perovskite materials into conventional silicon memory technology remains challenging due to their lack of compatibility with the complementary metal oxide semiconductor process (CMOS). The present communication reports the fabrication of an FTJ based on a CMOS compatible tunnel barrier Hf0.5Zr0.5O2 (6 unit cells thick) on an equally CMOS compatible TiN electrode. Analysis of the FTJ by grazing angle incidence X-ray diffraction confirmed the formation of the non-centrosymmetric orthorhombic phase (Pbc2_1, ferroelectric phase). The FTJ characterization is followed by the reconstruction of the electrostatic potential profile in the as-grown TiN/Hf0.5Zr0.5O2/Pt heterostructure. A direct tunneling current model across a trapezoidal barrier was used to correlate the electronic and electrical properties of our FTJ devices. The good agreement between the experimental and the theoretical model attests to the tunneling electroresistance effect (TER) in our FTJ device. A TER ratio of ~15 was calculated for the present FTJ device at low read voltage (+0.2 V). This study makes Hf0.5Zr0.5O2 a promising candidate for integration into conventional Si memory technology.

  5. Behavior of faulty double BJT BiCMOS logic gates

    NASA Technical Reports Server (NTRS)

    Menon, Sankaran M.; Malaiya, Yashwant K.; Jayasumana, Anura P.

    1992-01-01

    Logic Behavior of a Double BJT BiCMOS device under transistor level shorts and opens is examined. In addition to delay faults, faults that cause the gate to exhibit sequential behavior were observed. Several faults can be detected only by monitoring the current. The faulty behavior of Bipolar (TTL) and CMOS logic families is compared with BiCMOS, to bring out the testability differences.

  6. Correct CMOS IC defect models for quality testing

    NASA Technical Reports Server (NTRS)

    Soden, Jerry M.; Hawkins, Charles F.

    1993-01-01

    Leading edge, high reliability, and low escape CMOS IC test practices have now virtually removed the stuck-at fault model and replaced it with more defect-orientated models. Quiescent power supply current testing (I(sub DDQ)) combined with strategic use of high speed test patterns is the recommended approach to zero defect and high reliability testing goals. This paper reviews the reasons for the change in CMOS IC test practices and outlines an improved CMOS IC test methodology.

  7. Small-area and compact CMOS emulator circuit for CMOS/nanoscale memristor co-design

    PubMed Central

    2013-01-01

    In this paper, a CMOS emulator circuit that can reproduce nanoscale memristive behavior is proposed. The proposed emulator circuit can mimic the pinched hysteresis loops of nanoscale memristor memory's current-voltage relationship without using any resistor array, complicated circuit blocks, etc. that may occupy very large layout area. Instead of using a resistor array, other complicated circuit blocks, etc., the proposed emulator circuit can describe the nanoscale memristor's current-voltage relationship using a simple voltage-controlled resistor, where its resistance can be programmed by the stored voltage at the state variable capacitor. Comparing the layout area between the previous emulator circuit and the proposed one, the layout area of the proposed emulator circuit is estimated to be 32 times smaller than the previous emulator circuit. The proposed CMOS emulator circuit of nanoscale memristor memory will be very useful in developing hybrid circuits of CMOS/nanoscale memristor memory. PMID:24180626

  8. MEMS capacitive pressure sensor monolithically integrated with CMOS readout circuit by using post CMOS processes

    NASA Astrophysics Data System (ADS)

    Jang, Munseon; Yun, Kwang-Seok

    2017-12-01

    In this paper, we presents a MEMS pressure sensor integrated with a readout circuit on a chip for an on-chip signal processing. The capacitive pressure sensor is formed on a CMOS chip by using a post-CMOS MEMS processes. The proposed device consists of a sensing capacitor that is square in shape, a reference capacitor and a readout circuitry based on a switched-capacitor scheme to detect capacitance change at various environmental pressures. The readout circuit was implemented by using a commercial 0.35 μm CMOS process with 2 polysilicon and 4 metal layers. Then, the pressure sensor was formed by wet etching of metal 2 layer through via hole structures. Experimental results show that the MEMS pressure sensor has a sensitivity of 11 mV/100 kPa at the pressure range of 100-400 kPa.

  9. Small-area and compact CMOS emulator circuit for CMOS/nanoscale memristor co-design.

    PubMed

    Shin, Sanghak; Choi, Jun-Myung; Cho, Seongik; Min, Kyeong-Sik

    2013-11-01

    In this paper, a CMOS emulator circuit that can reproduce nanoscale memristive behavior is proposed. The proposed emulator circuit can mimic the pinched hysteresis loops of nanoscale memristor memory's current-voltage relationship without using any resistor array, complicated circuit blocks, etc. that may occupy very large layout area. Instead of using a resistor array, other complicated circuit blocks, etc., the proposed emulator circuit can describe the nanoscale memristor's current-voltage relationship using a simple voltage-controlled resistor, where its resistance can be programmed by the stored voltage at the state variable capacitor. Comparing the layout area between the previous emulator circuit and the proposed one, the layout area of the proposed emulator circuit is estimated to be 32 times smaller than the previous emulator circuit. The proposed CMOS emulator circuit of nanoscale memristor memory will be very useful in developing hybrid circuits of CMOS/nanoscale memristor memory.

  10. Advanced Silicon Technology Foundry Access Strategy for DoD Research

    DTIC Science & Technology

    2009-03-01

    TAPO access (90 nm CMOS & 130 nm BiCMOS) – Advanced Si-based RF research • Rad-Hard-By-Design Program – TAPO access for 90 nm CMOS – “special...access to 45 nm SOI CMOS • DARPA Seedlings – Cost effective TAPO access to 90 nm CMOS and 130 nm BiCMOS • FCRP Program (SRC/DARPA funded) – Cost effective... TAPO access to 90 nm CMOS and 130 nm BiCMOS • Trust Program – MOSIS access(90nm CMOS) Approved For Public Release, Distribution Unlimited DARPA TEAM

  11. Interferometric comparison of the performance of a CMOS and sCMOS detector

    NASA Astrophysics Data System (ADS)

    Flores-Moreno, J. M.; De la Torre I., Manuel H.; Hernández-Montes, M. S.; Pérez-López, Carlos; Mendoza S., Fernando

    2015-08-01

    We present an analysis of the imaging performance of two state-of-the-art sensors widely used in the nondestructive- testing area (NDT). The analysis is based on the quantification of the signal-to-noise (SNR) ratio from an optical phase image. The calculation of the SNR is based on the relation of the median (average) and standard deviation measurements over specific areas of interest in the phase images of both sensors. This retrieved phase is coming from the vibrational behavior of a large object by means of an out-of-plane holographic interferometer. The SNR is used as a figure-of-merit to evaluate and compare the performance of the CMOS and scientific CMOS (sCMOS) camera as part of the experimental set-up. One of the cameras has a high speed CMOS sensor while the other has a high resolution sCMOS sensor. The object under study is a metallically framed table with a Formica cover with an observable area of 1.1 m2. The vibration induced to the sample is performed by a linear step motor with an attached tip in the motion stage. Each camera is used once at the time to record the deformation keeping the same experimental conditions for each case. These measurements may complement the conventional procedures or technical information commonly used to evaluate a camerás performance such as: quantum efficiency, spatial resolution and others. Results present post processed images from both cameras, but showing a smoother and easy to unwrap optical phase coming from those recorded with the sCMOS camera.

  12. Fundamental performance differences of CMOS and CCD imagers: part V

    NASA Astrophysics Data System (ADS)

    Janesick, James R.; Elliott, Tom; Andrews, James; Tower, John; Pinter, Jeff

    2013-02-01

    Previous papers delivered over the last decade have documented developmental progress made on large pixel scientific CMOS imagers that match or surpass CCD performance. New data and discussions presented in this paper include: 1) a new buried channel CCD fabricated on a CMOS process line, 2) new data products generated by high performance custom scientific CMOS 4T/5T/6T PPD pixel imagers, 3) ultimate CTE and speed limits for large pixel CMOS imagers, 4) fabrication and test results of a flight 4k x 4k CMOS imager for NRL's SoloHi Solar Orbiter Mission, 5) a progress report on ultra large stitched Mk x Nk CMOS imager, 6) data generated by on-chip sub-electron CDS signal chain circuitry used in our imagers, 7) CMOS and CMOSCCD proton and electron radiation damage data for dose levels up to 10 Mrd, 8) discussions and data for a new class of PMOS pixel CMOS imagers and 9) future CMOS development work planned.

  13. Development of a Depleted Monolithic CMOS Sensor in a 150 nm CMOS Technology for the ATLAS Inner Tracker Upgrade

    NASA Astrophysics Data System (ADS)

    Wang, T.; Rymaszewski, P.; Barbero, M.; Degerli, Y.; Godiot, S.; Guilloux, F.; Hemperek, T.; Hirono, T.; Krüger, H.; Liu, J.; Orsini, F.; Pangaud, P.; Rozanov, A.; Wermes, N.

    2017-01-01

    The recent R&D focus on CMOS sensors with charge collection in a depleted zone has opened new perspectives for CMOS sensors as fast and radiation hard pixel devices. These sensors, labelled as depleted CMOS sensors (DMAPS), have already shown promising performance as feasible candidates for the ATLAS Inner Tracker (ITk) upgrade, possibly replacing the current passive sensors. A further step to exploit the potential of DMAPS is to investigate the suitability of equipping the outer layers of the ATLAS ITk upgrade with fully monolithic CMOS sensors. This paper presents the development of a depleted monolithic CMOS pixel sensor designed in the LFoundry 150 nm CMOS technology, with the focus on design details and simulation results.

  14. Current-mode CMOS hybrid image sensor

    NASA Astrophysics Data System (ADS)

    Benyhesan, Mohammad Kassim

    Digital imaging is growing rapidly making Complimentary Metal-Oxide-Semi conductor (CMOS) image sensor-based cameras indispensable in many modern life devices like cell phones, surveillance devices, personal computers, and tablets. For various purposes wireless portable image systems are widely deployed in many indoor and outdoor places such as hospitals, urban areas, streets, highways, forests, mountains, and towers. However, the increased demand on high-resolution image sensors and improved processing features is expected to increase the power consumption of the CMOS sensor-based camera systems. Increased power consumption translates into a reduced battery life-time. The increased power consumption might not be a problem if there is access to a nearby charging station. On the other hand, the problem arises if the image sensor is located in widely spread areas, unfavorable to human intervention, and difficult to reach. Given the limitation of energy sources available for wireless CMOS image sensor, an energy harvesting technique presents a viable solution to extend the sensor life-time. Energy can be harvested from the sun light or the artificial light surrounding the sensor itself. In this thesis, we propose a current-mode CMOS hybrid image sensor capable of energy harvesting and image capture. The proposed sensor is based on a hybrid pixel that can be programmed to perform the task of an image sensor and the task of a solar cell to harvest energy. The basic idea is to design a pixel that can be configured to exploit its internal photodiode to perform two functions: image sensing and energy harvesting. As a proof of concept a 40 x 40 array of hybrid pixels has been designed and fabricated in a standard 0.5 microm CMOS process. Measurement results show that up to 39 microW of power can be harvested from the array under 130 Klux condition with an energy efficiency of 220 nJ /pixel /frame. The proposed image sensor is a current-mode image sensor which has several

  15. High responsivity CMOS imager pixel implemented in SOI technology

    NASA Technical Reports Server (NTRS)

    Zheng, X.; Wrigley, C.; Yang, G.; Pain, B.

    2000-01-01

    Availability of mature sub-micron CMOS technology and the advent of the new low noise active pixel sensor (APS) concept have enabled the development of low power, miniature, single-chip, CMOS digital imagers in the decade of the 1990's.

  16. Accelerated life testing effects on CMOS microcircuit characteristics

    NASA Technical Reports Server (NTRS)

    1979-01-01

    Modifications and additions to the present process of making CMOS microcircuits which are designed to provide protective layers on the chip to guard against moisture and contaminants were investigated. High and low temperature Si3N4 protective layers were tested on the CMOS microcircuits and no conclusive improvements in device reliability characteristics were evidenced.

  17. Lab-on-CMOS integration of microfluidics and electrochemical sensors.

    PubMed

    Huang, Yue; Mason, Andrew J

    2013-10-07

    This paper introduces a CMOS-microfluidics integration scheme for electrochemical microsystems. A CMOS chip was embedded into a micro-machined silicon carrier. By leveling the CMOS chip and carrier surface to within 100 nm, an expanded obstacle-free surface suitable for photolithography was achieved. Thin film metal planar interconnects were microfabricated to bridge CMOS pads to the perimeter of the carrier, leaving a flat and smooth surface for integrating microfluidic structures. A model device containing SU-8 microfluidic mixers and detection channels crossing over microelectrodes on a CMOS integrated circuit was constructed using the chip-carrier assembly scheme. Functional integrity of microfluidic structures and on-CMOS electrodes was verified by a simultaneous sample dilution and electrochemical detection experiment within multi-channel microfluidics. This lab-on-CMOS integration process is capable of high packing density, is suitable for wafer-level batch production, and opens new opportunities to combine the performance benefits of on-CMOS sensors with lab-on-chip platforms.

  18. A CMOS field-programmable analog array

    NASA Astrophysics Data System (ADS)

    Lee, Edward K. F.; Gulak, P. G.

    1991-12-01

    The design details and test results of a field-programmable analog array (FPAA) prototype chip in 1.2-micron CMOS are presented. The analog array is based on subthreshold circuit techniques and consists of a collection of a homogeneous configurable analog blocks (CABs) and an interconnection network. Interconnections between CABs and the analog functions to be implemented in each block are defined by a set of configuration bits loaded serially into an onboard shift register by the user. Macromodels are developed for the analog functions in order to simulate various neural network applications on the field-programmable analog array.

  19. Vertical Isolation for Photodiodes in CMOS Imagers

    NASA Technical Reports Server (NTRS)

    Pain, Bedabrata

    2008-01-01

    In a proposed improvement in complementary metal oxide/semi conduct - or (CMOS) image detectors, two additional implants in each pixel would effect vertical isolation between the metal oxide/semiconductor field-effect transistors (MOSFETs) and the photodiode of the pixel. This improvement is expected to enable separate optimization of the designs of the photodiode and the MOSFETs so as to optimize their performances independently of each other. The purpose to be served by enabling this separate optimization is to eliminate or vastly reduce diffusion cross-talk, thereby increasing sensitivity, effective spatial resolution, and color fidelity while reducing noise.

  20. CMOS-integrated geometrically tunable optical filters.

    PubMed

    Lerose, Damiana; Hei, Evie Kho Siaw; Ching, Bong Ching; Sterger, Martin; Yaw, Liau Chu; Schulze, Frank Michael; Schmidt, Frank; Schmidt, Andrei; Bach, Konrad

    2013-03-10

    We present a method for producing monolithically integrated complementary metal-oxide-semiconductor (CMOS) optical filters with different and customer-specific responses. The filters are constituted by a Fabry-Perot resonator formed by two Bragg mirrors separated by a patterned cavity. The filter response can be tuned by changing the geometric parameters of the patterning, and consequently the cavity effective refractive index. In this way, many different filters can be produced at once on a single chip, allowing multichanneling. The filter has been designed, produced, and characterized. The results for a chip with 24 filters are presented.

  1. CMOS current controlled fully balanced current conveyor

    NASA Astrophysics Data System (ADS)

    Chunhua, Wang; Qiujing, Zhang; Haiguang, Liu

    2009-07-01

    This paper presents a current controlled fully balanced second-generation current conveyor circuit (CF-BCCII). The proposed circuit has the traits of fully balanced architecture, and its X-Y terminals are current controllable. Based on the CFBCCII, two biquadratic universal filters are also proposed as its applications. The CFBCCII circuits and the two filters were fabricated with chartered 0.35-μm CMOS technology; with ±1.65 V power supply voltage, the total power consumption of the CFBCCII circuit is 3.6 mW. Comparisons between measured and HSpice simulation results are also given.

  2. Monolithic CMOS imaging x-ray spectrometers

    NASA Astrophysics Data System (ADS)

    Kenter, Almus; Kraft, Ralph; Gauron, Thomas; Murray, Stephen S.

    2014-07-01

    The Smithsonian Astrophysical Observatory (SAO) in collaboration with SRI/Sarnoff is developing monolithic CMOS detectors optimized for x-ray astronomy. The goal of this multi-year program is to produce CMOS x-ray imaging spectrometers that are Fano noise limited over the 0.1-10keV energy band while incorporating the many benefits of CMOS technology. These benefits include: low power consumption, radiation "hardness", high levels of integration, and very high read rates. Small format test devices from a previous wafer fabrication run (2011-2012) have recently been back-thinned and tested for response below 1keV. These devices perform as expected in regards to dark current, read noise, spectral response and Quantum Efficiency (QE). We demonstrate that running these devices at rates ~> 1Mpix/second eliminates the need for cooling as shot noise from any dark current is greatly mitigated. The test devices were fabricated on 15μm, high resistivity custom (~30kΩ-cm) epitaxial silicon and have a 16 by 192 pixel format. They incorporate 16μm pitch, 6 Transistor Pinned Photo Diode (6TPPD) pixels which have ~40μV/electron sensitivity and a highly parallel analog CDS signal chain. Newer, improved, lower noise detectors have just been fabricated (October 2013). These new detectors are fabricated on 9μm epitaxial silicon and have a 1k by 1k format. They incorporate similar 16μm pitch, 6TPPD pixels but have ~ 50% higher sensitivity and much (3×) lower read noise. These new detectors have undergone preliminary testing for functionality in Front Illuminated (FI) form and are presently being prepared for back thinning and packaging. Monolithic CMOS devices such as these, would be ideal candidate detectors for the focal planes of Solar, planetary and other space-borne x-ray astronomy missions. The high through-put, low noise and excellent low energy response, provide high dynamic range and good time resolution; bright, time varying x-ray features could be temporally and

  3. Color recognition sensor in standard CMOS technology

    NASA Astrophysics Data System (ADS)

    Batistell, Graciele; Zhang, Vincent Chi; Sturm, Johannes

    2014-12-01

    Two integrated color detectors are presented as a solution for low cost color sensing applications. The color detection is based on lateral carrier diffusion and wavelength-dependent absorption-depth. The proposed detectors are implemented in a standard 130 nm CMOS technology without process modification or color filters. Three independent output signals are obtained with spectral responsivities optimized to short, middle and long wavelengths. R, G, B or X, Y, Z standard color representation can be realized by a linear transformation of the output signals.

  4. Diurnal measurements with prototype CMOS Omega receivers

    NASA Technical Reports Server (NTRS)

    Burhans, R. W.

    1976-01-01

    Diurnal signals from eight omega channels have been monitored at 10.2 KHz for selected station pairs. All eight Omega stations have been received at least 50 percent of the time over a 24 hour period during the month of October 1976. The data presented confirm the expected performance of the CMOS omega sensor processor in being able to digsignals out of a noisy environment. Of particular interest are possibilities for use of antipodal reception phenomena and a need for some ways of correcting for multi-modal propagation effects.

  5. A Wideband Noise-canceling CMOS LNA Using Cross-coupled Feedback and Bulk Effect

    NASA Astrophysics Data System (ADS)

    Guo, Benqing; Yang, Guoning; An, Shiquan

    2014-05-01

    An improved wideband common-gate (CG) and common-source (CS) CMOS LNA with noise cancellation is proposed. The cross-coupled feedback between the CG input transistor and the cascode transistor of CS input stage is used to increase the input transconductance of the LNA. And the bulk effect of CS input transistors is utilized to enhance gm-boosting coefficient. Thus, comparable gain and noise are achieved by reduced bias currents of the LNA while the resulted additional NF degradation is negligible. Fabricated in a 0.13 μm RF CMOS process, the LNA achieves a flat voltage gain of 18 dB, an NF of 2.7~3.2 dB, and an IIP3 of -4.5~-7.4 dBm over a 3 dB bandwidth of 0.1~4.4 GHz. It consumes only 4.1 mA from a 1 V supply and occupies an area of 520 × 490 um2. In contrast to those of reported wideband LNAs, the proposed LNA has the merit of lower power consumption and lower supply voltage.

  6. Design of high speed camera based on CMOS technology

    NASA Astrophysics Data System (ADS)

    Park, Sei-Hun; An, Jun-Sick; Oh, Tae-Seok; Kim, Il-Hwan

    2007-12-01

    The capacity of a high speed camera in taking high speed images has been evaluated using CMOS image sensors. There are 2 types of image sensors, namely, CCD and CMOS sensors. CMOS sensor consumes less power than CCD sensor and can take images more rapidly. High speed camera with built-in CMOS sensor is widely used in vehicle crash tests and airbag controls, golf training aids, and in bullet direction measurement in the military. The High Speed Camera System made in this study has the following components: CMOS image sensor that can take about 500 frames per second at a resolution of 1280*1024; FPGA and DDR2 memory that control the image sensor and save images; Camera Link Module that transmits saved data to PC; and RS-422 communication function that enables control of the camera from a PC.

  7. Broadband image sensor array based on graphene-CMOS integration

    NASA Astrophysics Data System (ADS)

    Goossens, Stijn; Navickaite, Gabriele; Monasterio, Carles; Gupta, Shuchi; Piqueras, Juan José; Pérez, Raúl; Burwell, Gregory; Nikitskiy, Ivan; Lasanta, Tania; Galán, Teresa; Puma, Eric; Centeno, Alba; Pesquera, Amaia; Zurutuza, Amaia; Konstantatos, Gerasimos; Koppens, Frank

    2017-06-01

    Integrated circuits based on complementary metal-oxide-semiconductors (CMOS) are at the heart of the technological revolution of the past 40 years, enabling compact and low-cost microelectronic circuits and imaging systems. However, the diversification of this platform into applications other than microcircuits and visible-light cameras has been impeded by the difficulty to combine semiconductors other than silicon with CMOS. Here, we report the monolithic integration of a CMOS integrated circuit with graphene, operating as a high-mobility phototransistor. We demonstrate a high-resolution, broadband image sensor and operate it as a digital camera that is sensitive to ultraviolet, visible and infrared light (300-2,000 nm). The demonstrated graphene-CMOS integration is pivotal for incorporating 2D materials into the next-generation microelectronics, sensor arrays, low-power integrated photonics and CMOS imaging systems covering visible, infrared and terahertz frequencies.

  8. A Monolithic CMOS Magnetic Hall Sensor with High Sensitivity and Linearity Characteristics.

    PubMed

    Huang, Haiyun; Wang, Dejun; Xu, Yue

    2015-10-27

    This paper presents a fully integrated linear Hall sensor by means of 0.8 μm high voltage complementary metal-oxide semiconductor (CMOS) technology. This monolithic Hall sensor chip features a highly sensitive horizontal switched Hall plate and an efficient signal conditioner using dynamic offset cancellation technique. An improved cross-like Hall plate achieves high magnetic sensitivity and low offset. A new spinning current modulator stabilizes the quiescent output voltage and improves the reliability of the signal conditioner. The tested results show that at the 5 V supply voltage, the maximum Hall output voltage of the monolithic Hall sensor microsystem, is up to ±2.1 V and the linearity of Hall output voltage is higher than 99% in the magnetic flux density range from ±5 mT to ±175 mT. The output equivalent residual offset is 0.48 mT and the static power consumption is 20 mW.

  9. A Low Noise CMOS Readout Based on a Polymer-Coated SAW Array for Miniature Electronic Nose

    PubMed Central

    Wu, Cheng-Chun; Liu, Szu-Chieh; Chiu, Shih-Wen; Tang, Kea-Tiong

    2016-01-01

    An electronic nose (E-Nose) is one of the applications for surface acoustic wave (SAW) sensors. In this paper, we present a low-noise complementary metal–oxide–semiconductor (CMOS) readout application-specific integrated circuit (ASIC) based on an SAW sensor array for achieving a miniature E-Nose. The center frequency of the SAW sensors was measured to be approximately 114 MHz. Because of interference between the sensors, we designed a low-noise CMOS frequency readout circuit to enable the SAW sensor to obtain frequency variation. The proposed circuit was fabricated in Taiwan Semiconductor Manufacturing Company (TSMC) 0.18 μm 1P6M CMOS process technology. The total chip size was nearly 1203 × 1203 μm2. The chip was operated at a supply voltage of 1 V for a digital circuit and 1.8 V for an analog circuit. The least measurable difference between frequencies was 4 Hz. The detection limit of the system, when estimated using methanol and ethanol, was 0.1 ppm. Their linearity was in the range of 0.1 to 26,000 ppm. The power consumption levels of the analog and digital circuits were 1.742 mW and 761 μW, respectively. PMID:27792131

  10. An Ultra-Low Power CMOS Image Sensor with On-Chip Energy Harvesting and Power Management Capability

    PubMed Central

    Cevik, Ismail; Huang, Xiwei; Yu, Hao; Yan, Mei; Ay, Suat U.

    2015-01-01

    An ultra-low power CMOS image sensor with on-chip energy harvesting and power management capability is introduced in this paper. The photodiode pixel array can not only capture images but also harvest solar energy. As such, the CMOS image sensor chip is able to switch between imaging and harvesting modes towards self-power operation. Moreover, an on-chip maximum power point tracking (MPPT)-based power management system (PMS) is designed for the dual-mode image sensor to further improve the energy efficiency. A new isolated P-well energy harvesting and imaging (EHI) pixel with very high fill factor is introduced. Several ultra-low power design techniques such as reset and select boosting techniques have been utilized to maintain a wide pixel dynamic range. The chip was designed and fabricated in a 1.8 V, 1P6M 0.18 µm CMOS process. Total power consumption of the imager is 6.53 µW for a 96 × 96 pixel array with 1 V supply and 5 fps frame rate. Up to 30 μW of power could be generated by the new EHI pixels. The PMS is capable of providing 3× the power required during imaging mode with 50% efficiency allowing energy autonomous operation with a 72.5% duty cycle. PMID:25756863

  11. An ultra-low power CMOS image sensor with on-chip energy harvesting and power management capability.

    PubMed

    Cevik, Ismail; Huang, Xiwei; Yu, Hao; Yan, Mei; Ay, Suat U

    2015-03-06

    An ultra-low power CMOS image sensor with on-chip energy harvesting and power management capability is introduced in this paper. The photodiode pixel array can not only capture images but also harvest solar energy. As such, the CMOS image sensor chip is able to switch between imaging and harvesting modes towards self-power operation. Moreover, an on-chip maximum power point tracking (MPPT)-based power management system (PMS) is designed for the dual-mode image sensor to further improve the energy efficiency. A new isolated P-well energy harvesting and imaging (EHI) pixel with very high fill factor is introduced. Several ultra-low power design techniques such as reset and select boosting techniques have been utilized to maintain a wide pixel dynamic range. The chip was designed and fabricated in a 1.8 V, 1P6M 0.18 µm CMOS process. Total power consumption of the imager is 6.53 µW for a 96 × 96 pixel array with 1 V supply and 5 fps frame rate. Up to 30 μW of power could be generated by the new EHI pixels. The PMS is capable of providing 3× the power required during imaging mode with 50% efficiency allowing energy autonomous operation with a 72.5% duty cycle.

  12. A Low Noise CMOS Readout Based on a Polymer-Coated SAW Array for Miniature Electronic Nose.

    PubMed

    Wu, Cheng-Chun; Liu, Szu-Chieh; Chiu, Shih-Wen; Tang, Kea-Tiong

    2016-10-25

    An electronic nose (E-Nose) is one of the applications for surface acoustic wave (SAW) sensors. In this paper, we present a low-noise complementary metal-oxide-semiconductor (CMOS) readout application-specific integrated circuit (ASIC) based on an SAW sensor array for achieving a miniature E-Nose. The center frequency of the SAW sensors was measured to be approximately 114 MHz. Because of interference between the sensors, we designed a low-noise CMOS frequency readout circuit to enable the SAW sensor to obtain frequency variation. The proposed circuit was fabricated in Taiwan Semiconductor Manufacturing Company (TSMC) 0.18 μm 1P6M CMOS process technology. The total chip size was nearly 1203 × 1203 μm². The chip was operated at a supply voltage of 1 V for a digital circuit and 1.8 V for an analog circuit. The least measurable difference between frequencies was 4 Hz. The detection limit of the system, when estimated using methanol and ethanol, was 0.1 ppm. Their linearity was in the range of 0.1 to 26,000 ppm. The power consumption levels of the analog and digital circuits were 1.742 mW and 761 μW, respectively.

  13. Printed thin film transistors and CMOS inverters based on semiconducting carbon nanotube ink purified by a nonlinear conjugated copolymer.

    PubMed

    Xu, Wenya; Dou, Junyan; Zhao, Jianwen; Tan, Hongwei; Ye, Jun; Tange, Masayoshi; Gao, Wei; Xu, Weiwei; Zhang, Xiang; Guo, Wenrui; Ma, Changqi; Okazaki, Toshiya; Zhang, Kai; Cui, Zheng

    2016-02-28

    Two innovative research studies are reported in this paper. One is the sorting of semiconducting carbon nanotubes and ink formulation by a novel semiconductor copolymer and second is the development of CMOS inverters using not the p-type and n-type transistors but a printed p-type transistor and a printed ambipolar transistor. A new semiconducting copolymer (named P-DPPb5T) was designed and synthesized with a special nonlinear structure and more condensed conjugation surfaces, which can separate large diameter semiconducting single-walled carbon nanotubes (sc-SWCNTs) from arc discharge SWCNTs according to their chiralities with high selectivity. With the sorted sc-SWCNTs ink, thin film transistors (TFTs) have been fabricated by aerosol jet printing. The TFTs displayed good uniformity, low operating voltage (±2 V) and subthreshold swing (SS) (122-161 mV dec(-1)), high effective mobility (up to 17.6-37.7 cm(2) V(-1) s(-1)) and high on/off ratio (10(4)-10(7)). With the printed TFTs, a CMOS inverter was constructed, which is based on the p-type TFT and ambipolar TFT instead of the conventional p-type and n-type TFTs. Compared with other recently reported inverters fabricated by printing, the printed CMOS inverters demonstrated a better noise margin (74% 1/2 Vdd) and was hysteresis free. The inverter has a voltage gain of up to 16 at an applied voltage of only 1 V and low static power consumption.

  14. A CMOS high speed imaging system design based on FPGA

    NASA Astrophysics Data System (ADS)

    Tang, Hong; Wang, Huawei; Cao, Jianzhong; Qiao, Mingrui

    2015-10-01

    CMOS sensors have more advantages than traditional CCD sensors. The imaging system based on CMOS has become a hot spot in research and development. In order to achieve the real-time data acquisition and high-speed transmission, we design a high-speed CMOS imaging system on account of FPGA. The core control chip of this system is XC6SL75T and we take advantages of CameraLink interface and AM41V4 CMOS image sensors to transmit and acquire image data. AM41V4 is a 4 Megapixel High speed 500 frames per second CMOS image sensor with global shutter and 4/3" optical format. The sensor uses column parallel A/D converters to digitize the images. The CameraLink interface adopts DS90CR287 and it can convert 28 bits of LVCMOS/LVTTL data into four LVDS data stream. The reflected light of objects is photographed by the CMOS detectors. CMOS sensors convert the light to electronic signals and then send them to FPGA. FPGA processes data it received and transmits them to upper computer which has acquisition cards through CameraLink interface configured as full models. Then PC will store, visualize and process images later. The structure and principle of the system are both explained in this paper and this paper introduces the hardware and software design of the system. FPGA introduces the driven clock of CMOS. The data in CMOS is converted to LVDS signals and then transmitted to the data acquisition cards. After simulation, the paper presents a row transfer timing sequence of CMOS. The system realized real-time image acquisition and external controls.

  15. Theoretical performance analysis for CMOS based high resolution detectors.

    PubMed

    Jain, Amit; Bednarek, Daniel R; Rudin, Stephen

    2013-03-06

    High resolution imaging capabilities are essential for accurately guiding successful endovascular interventional procedures. Present x-ray imaging detectors are not always adequate due to their inherent limitations. The newly-developed high-resolution micro-angiographic fluoroscope (MAF-CCD) detector has demonstrated excellent clinical image quality; however, further improvement in performance and physical design may be possible using CMOS sensors. We have thus calculated the theoretical performance of two proposed CMOS detectors which may be used as a successor to the MAF. The proposed detectors have a 300 μm thick HL-type CsI phosphor, a 50 μm-pixel CMOS sensor with and without a variable gain light image intensifier (LII), and are designated MAF-CMOS-LII and MAF-CMOS, respectively. For the performance evaluation, linear cascade modeling was used. The detector imaging chains were divided into individual stages characterized by one of the basic processes (quantum gain, binomial selection, stochastic and deterministic blurring, additive noise). Ranges of readout noise and exposure were used to calculate the detectors' MTF and DQE. The MAF-CMOS showed slightly better MTF than the MAF-CMOS-LII, but the MAF-CMOS-LII showed far better DQE, especially for lower exposures. The proposed detectors can have improved MTF and DQE compared with the present high resolution MAF detector. The performance of the MAF-CMOS is excellent for the angiography exposure range; however it is limited at fluoroscopic levels due to additive instrumentation noise. The MAF-CMOS-LII, having the advantage of the variable LII gain, can overcome the noise limitation and hence may perform exceptionally for the full range of required exposures; however, it is more complex and hence more expensive.

  16. Bulk CMOS VLSI Technology Studies. Part 1. Scalable CMOS Design Rules. Part 2. CMOS Approaches to PLA (Programmable Logic Array) Design.

    DTIC Science & Technology

    2014-09-26

    microns %H*SIC dimensions. Part 2: Various Programmable Logic Array (PLA) implementations with clocked CMOS technology are explored inthis project...Previous research at MSU has dealt with clocked CMOS circuit styles with some application to gate array and microprocessor applications. Work under this...in this report deals with structured logic schemes based on Programmable Logic Arrays (PLAs). Three different PLA design methods are reported with a

  17. The 1.2 micron CMOS technology

    NASA Technical Reports Server (NTRS)

    Pina, C. A.

    1985-01-01

    A set of test structures was designed using the Jet Propulsion Laboratory (JPL) test chip assembler and was used to evaluate the first CMOS-bulk foundry runs with feature sizes of 1.2 microns. In addition to the problems associated with the physical scaling of the structures, this geometry provided an additional set of problems, since the design files had to be generated in such a way as to be capable of being processed through p-well, n-well, and twin-well processing lines. This requirement meant that the files containing the geometric design rules as well as the structure design files had to produce process-insensitive designs, a requirement that does not apply to the more mature 3.0-micron CMOS feature size technology. Because of the photolithographic steps required with this feature size, the maximum allowable chip size was 10 x 10 mm, and this chip was divided into 24 project areas, with each area being 1.6 x 1.6 mm in size. The JPL-designed structures occupied 13 out of the 21 allowable project sizes and provided the only test information obtained from these three preliminary runs. The structures were used to successfully evaluate three different manufacturing runs through two separate foundries.

  18. Modulated CMOS camera for fluorescence lifetime microscopy.

    PubMed

    Chen, Hongtao; Holst, Gerhard; Gratton, Enrico

    2015-12-01

    Widefield frequency-domain fluorescence lifetime imaging microscopy (FD-FLIM) is a fast and accurate method to measure the fluorescence lifetime of entire images. However, the complexity and high costs involved in construction of such a system limit the extensive use of this technique. PCO AG recently released the first luminescence lifetime imaging camera based on a high frequency modulated CMOS image sensor, QMFLIM2. Here we tested and provide operational procedures to calibrate the camera and to improve the accuracy using corrections necessary for image analysis. With its flexible input/output options, we are able to use a modulated laser diode or a 20 MHz pulsed white supercontinuum laser as the light source. The output of the camera consists of a stack of modulated images that can be analyzed by the SimFCS software using the phasor approach. The nonuniform system response across the image sensor must be calibrated at the pixel level. This pixel calibration is crucial and needed for every camera settings, e.g. modulation frequency and exposure time. A significant dependency of the modulation signal on the intensity was also observed and hence an additional calibration is needed for each pixel depending on the pixel intensity level. These corrections are important not only for the fundamental frequency, but also for the higher harmonics when using the pulsed supercontinuum laser. With these post data acquisition corrections, the PCO CMOS-FLIM camera can be used for various biomedical applications requiring a large frame and high speed acquisition.

  19. Metrology Of Silicide Contacts For Future CMOS

    NASA Astrophysics Data System (ADS)

    Zollner, Stefan; Gregory, Richard B.; Kottke, M. L.; Vartanian, Victor; Wang, Xiang-Dong; Theodore, David; Fejes, P. L.; Conner, J. R.; Raymond, Mark; Zhu, Xiaoyan; Denning, Dean; Bolton, Scott; Chang, Kyuhwan; Noble, Ross; Jahanbani, Mohamad; Rossow, Marc; Goedeke, Darren; Filipiak, Stan; Garcia, Ricardo; Jawarani, Dharmesh; Taylor, Bill; Nguyen, Bich-Yen; Crabtree, P. E.; Thean, Aaron

    2007-09-01

    Silicide materials (NiSi, CoSi2, TiSi2, etc) are used to form low-resistance contacts between the back-end (W plugs and Cu interconnects) and front-end portions (silicon source, drain, and gate regions) of integrated CMOS circuits. At the 65 nm node, a transition from CoSi2 to NiSi was necessary because of the unique capability of NiSi to form narrow silicide nanowires on active (monocrystalline) and gate (polycrystalline) lines. Like its predecessors TiSi2 and CoSi2, NiSi is a mid-gap silicide, i.e., the Fermi level of the NiSi metal is pinned half-way between the conduction and valence band edges in silicon. This leads to a Schottky barrier between the silicide and silicon source-drain regions, which creates undesirable parasitic resistances. For future CMOS generations, band-edge silicides, such as PtSi for contacts to p-type or rare earth silicides for contacts to n-type Si will be needed. This paper reviews metrology and characterization techniques for NiSi process control for development and manufacturing, with special emphasis on x-ray reflectance and x-ray fluorescence. We also report measurement methods useful for development of a PtSi PMOS module.

  20. Fault detection in CMOS manufacturing using MBPCA

    NASA Astrophysics Data System (ADS)

    Lachman-Shalem, Sivan; Haimovitch, Nir; Shauly, Eitan N.; Lewin, Daniel R.

    2000-08-01

    This paper describes the application of model-based principal component analysis (MBPCA) to the identification and isolation of faults in CMOS manufacture. Some of the CMOS fabrication processing steps are well understood, with first principles mathematical models available which can describe the physical and chemical phenomena that takes place. The fabrication of the device using a known industrial process is therefore first modeled 'ideally', using ATHENA and MATLAB. Detailed furnace models are used to investigate the effect of errors in furnace control on the device fabrication and the subsequent effect on the device electrical properties. This models the distribution of device properties resulting from processing a stack of wafers in a furnace, and allows faults and production errors to be simulated for analysis. The analysis is performed using MBPCA. which has been shown to improve fault-detection resolution for batch processes. The diagnosis method is demonstrated on an industrial NMOS transistor fabrication process with faults introduced in places where they might realistically occur.

  1. Challenges of nickel silicidation in CMOS technologies

    SciTech Connect

    Breil, Nicolas; Lavoie, Christian; Ozcan, Ahmet; Baumann, Frieder; Klymko, Nancy; Nummy, Karen; Sun, Bing; Jordan-Sweet, Jean; Yu, Jian; Zhu, Frank; Narasimha, Shreesh; Chudzik, Michael

    2015-04-01

    In our paper, we review some of the key challenges associated with the Ni silicidation process in the most recent CMOS technologies. The introduction of new materials (e.g.SiGe), and of non-planar architectures bring some important changes that require fundamental investigation from a material engineering perspective. Following a discussion of the device architecture and silicide evolution through the last CMOS generations, we focus our study on a very peculiar defect, termed NiSi-Fangs. We describe a mechanism for the defect formation, and present a detailed material analysis that supports this mechanism. We highlight some of the possible metal enrichment processes of the nickel monosilicide such as oxidation or various RIE (Reactive Ion Etching) plasma process, leading to a metal source available for defect formation. Furthermore, we investigate the NiSi formation and re-formation silicidation differences between Si and SiGe materials, and between (1 0 0) and (1 1 1) orientations. Finally, we show that the thermal budgets post silicidation can lead to the formation of NiSi-Fangs if the structure and the processes are not optimized. Beyond the understanding of the defect and the discussion on the engineering solutions used to prevent its formation, the interest of this investigation also lies in the fundamental learning within the Ni–Pt–Si–Ge system and some additional perspective on Ni-based contacts to advanced microelectronic devices.

  2. All-CMOS night vision viewer with integrated microdisplay

    NASA Astrophysics Data System (ADS)

    Goosen, Marius E.; Venter, Petrus J.; du Plessis, Monuko; Faure, Nicolaas M.; Janse van Rensburg, Christo; Rademeyer, Pieter

    2014-02-01

    The unrivalled integration potential of CMOS has made it the dominant technology for digital integrated circuits. With the advent of visible light emission from silicon through hot carrier electroluminescence, several applications arose, all of which rely upon the advantages of mature CMOS technologies for a competitive edge in a very active and attractive market. In this paper we present a low-cost night vision viewer which employs only standard CMOS technologies. A commercial CMOS imager is utilized for near infrared image capturing with a 128x96 pixel all-CMOS microdisplay implemented to convey the image to the user. The display is implemented in a standard 0.35 μm CMOS process, with no process alterations or post processing. The display features a 25 μm pixel pitch and a 3.2 mm x 2.4 mm active area, which through magnification presents the virtual image to the user equivalent of a 19-inch display viewed from a distance of 3 meters. This work represents the first application of a CMOS microdisplay in a low-cost consumer product.

  3. Monolithic CMUT on CMOS Integration for Intravascular Ultrasound Applications

    PubMed Central

    Zahorian, Jaime; Hochman, Michael; Xu, Toby; Satir, Sarp; Gurun, Gokce; Karaman, Mustafa; Degertekin, F. Levent

    2012-01-01

    One of the most important promises of capacitive micromachined ultrasonic transducer (CMUT) technology is integration with electronics. This approach is required to minimize the parasitic capacitances in the receive mode, especially in catheter based volumetric imaging arrays where the elements need to be small. Furthermore, optimization of the available silicon area and minimized number of connections occurs when the CMUTs are fabricated directly above the associated electronics. Here, we describe successful fabrication and performance evaluation of CMUT arrays for intravascular imaging on custom designed CMOS receiver electronics from a commercial IC foundry. The CMUT on CMOS process starts with surface isolation and mechanical planarization of the CMOS electronics to reduce topography. The rest of the CMUT fabrication is achieved by modifying a low temperature micromachining process through the addition of a single mask and developing a dry etching step to produce sloped sidewalls for simple and reliable CMUT to CMOS interconnection. This CMUT to CMOS interconnect method reduced the parasitic capacitance by a factor of 200 when compared with a standard wire bonding method. Characterization experiments indicate that the CMUT on CMOS elements are uniform in frequency response and are similar to CMUTs simultaneously fabricated on standard silicon wafers without electronics integration. Experiments on a 1.6 mm diameter dual-ring CMUT array with a 15 MHz center frequency show that both the CMUTs and the integrated CMOS electronics are fully functional. The SNR measurements indicate that the performance is adequate for imaging CTOs located 1 cm away from the CMUT array. PMID:23443701

  4. CMOS Devices and Beyond — A Process Integration Perspective

    NASA Astrophysics Data System (ADS)

    Hutchby, James A.; Zhirnov, Victor; Cavin, Ralph; Bourianoff, George

    2003-09-01

    Development of CMOS technology is approaching severe technological limits in the next 10 - 15 years. Overcoming these limits will demand introduction of new manufacturable materials and device structures to extend the speed of silicon integrated circuits at the historical rate of 17 % per year to the end of the 2001 International Technology Roadmap for Semiconductors (2016). Following a brief discussion of these limits, this paper will review the most promising approaches to new materials, device structures and issues related to their integration in advanced CMOS structures. The paper will conclude with some brief observations and issues regarding extension of CMOS-like FET structures via new nano-scale materials.

  5. Lower-Dark-Current, Higher-Blue-Response CMOS Imagers

    NASA Technical Reports Server (NTRS)

    Pain, Bedabrata; Cunningham, Thomas; Hancock, Bruce

    2008-01-01

    Several improved designs for complementary metal oxide/semiconductor (CMOS) integrated-circuit image detectors have been developed, primarily to reduce dark currents (leakage currents) and secondarily to increase responses to blue light and increase signal-handling capacities, relative to those of prior CMOS imagers. The main conclusion that can be drawn from a study of the causes of dark currents in prior CMOS imagers is that dark currents could be reduced by relocating p/n junctions away from Si/SiO2 interfaces. In addition to reflecting this conclusion, the improved designs include several other features to counteract dark-current mechanisms and enhance performance.

  6. Ink-Jet Printed CMOS Electronics from Oxide Semiconductors.

    PubMed

    Garlapati, Suresh Kumar; Baby, Tessy Theres; Dehm, Simone; Hammad, Mohammed; Chakravadhanula, Venkata Sai Kiran; Kruk, Robert; Hahn, Horst; Dasgupta, Subho

    2015-08-05

    Complementary metal oxide semiconductor (CMOS) technology with high transconductance and signal gain is mandatory for practicable digital/analog logic electronics. However, high performance all-oxide CMOS logics are scarcely reported in the literature; specifically, not at all for solution-processed/printed transistors. As a major step toward solution-processed all-oxide electronics, here it is shown that using a highly efficient electrolyte-gating approach one can obtain printed and low-voltage operated oxide CMOS logics with high signal gain (≈21 at a supply voltage of only 1.5 V) and low static power dissipation.

  7. A monolithically integrated torsional CMOS-MEMS relay

    NASA Astrophysics Data System (ADS)

    Riverola, M.; Sobreviela, G.; Torres, F.; Uranga, A.; Barniol, N.

    2016-11-01

    We report experimental demonstrations of a torsional microelectromechanical (MEM) relay fabricated using the CMOS-MEMS approach (or intra-CMOS) which exploits the full foundry inherent characteristics enabling drastic reduction of the fabrication costs and batch production. In particular, the relay is monolithically integrated in the back end of line of a commercial standard CMOS technology (AMS 0.35 μm) and released by means of a simple one-step mask-less wet etching. The fabricated torsional relay exhibits an extremely steep switching behaviour symmetrical about both contact sides with an on-state contact resistance in the k Ω -range throughout the on-off cycling test.

  8. Radiation tolerant 1 micron CMOS technology

    NASA Astrophysics Data System (ADS)

    Crevel, P.; Rodde, K.

    1991-03-01

    Starting from a standard one micron Complementary Metal Oxide Semiconductor (CMOS) for high density, low power memory applications, the degree of radiation tolerance of the baseline process is evaluated. Implemented process modifications to improve latchup sensitivity under heavy ion irradiation as well as total dose effects without changing layout rules are described. By changing doping profiles in Metal Nitride Oxide Semiconductors (MNOS) and P-channel MOS (PMOS) device regions, it is possible to guarantee data sheet specification of a 64 K low power static RAM for total gamma dose up to 35 krad (Si) (and even higher values for the gate array family) without latch up for Linear Energy Transfer LET up to 115 MeV/(mg/cm squared).

  9. Latchup in CMOS devices from heavy ions

    NASA Technical Reports Server (NTRS)

    Soliman, K.; Nichols, D. K.

    1983-01-01

    It is noted that complementary metal oxide semiconductor (CMOS) microcircuits are inherently latchup prone. The four-layer n-p-n-p structures formed from the parasitic pnp and npn transistors make up a silicon controlled rectifier. If properly biased, this rectifier may be triggered 'ON' by electrical transients, ionizing radiation, or a single heavy ion. This latchup phenomenon might lead to a loss of functionality or device burnout. Results are presented from tests on 19 different device types from six manufacturers which investigate their latchup sensitivity with argon and krypton beams. The parasitic npnp paths are identified in general, and a qualitative rationale is given for latchup susceptibility, along with a latchup cross section for each type of device. Also presented is the correlation between bit-flip sensitivity and latchup susceptibility.

  10. Latchup in CMOS devices from heavy ions

    NASA Technical Reports Server (NTRS)

    Soliman, K.; Nichols, D. K.

    1983-01-01

    It is noted that complementary metal oxide semiconductor (CMOS) microcircuits are inherently latchup prone. The four-layer n-p-n-p structures formed from the parasitic pnp and npn transistors make up a silicon controlled rectifier. If properly biased, this rectifier may be triggered 'ON' by electrical transients, ionizing radiation, or a single heavy ion. This latchup phenomenon might lead to a loss of functionality or device burnout. Results are presented from tests on 19 different device types from six manufacturers which investigate their latchup sensitivity with argon and krypton beams. The parasitic npnp paths are identified in general, and a qualitative rationale is given for latchup susceptibility, along with a latchup cross section for each type of device. Also presented is the correlation between bit-flip sensitivity and latchup susceptibility.

  11. CMOS digital pixel sensors: technology and applications

    NASA Astrophysics Data System (ADS)

    Skorka, Orit; Joseph, Dileepan

    2014-04-01

    CMOS active pixel sensor technology, which is widely used these days for digital imaging, is based on analog pixels. Transition to digital pixel sensors can boost signal-to-noise ratios and enhance image quality, but can increase pixel area to dimensions that are impractical for the high-volume market of consumer electronic devices. There are two main approaches to digital pixel design. The first uses digitization methods that largely rely on photodetector properties and so are unique to imaging. The second is based on adaptation of a classical analog-to-digital converter (ADC) for in-pixel data conversion. Imaging systems for medical, industrial, and security applications are emerging lower-volume markets that can benefit from these in-pixel ADCs. With these applications, larger pixels are typically acceptable, and imaging may be done in invisible spectral bands.

  12. 1984 Joint Congress: CGU and CMOS

    NASA Astrophysics Data System (ADS)

    Camfield, P. A.

    The Canadian Geophysical Union (CGU) had a very successful joint meeting with the Canadian Meteorological and Oceanographic Society (CMOS) at Dalhousie University in Halifax, Nova Scotia, May 29 to June 1, 1984. Thirty-five scientific sessions were held in the 4-day meeting period.The invited speaker for CGU at the plenary session, David Simpson of Lamont-Doherty Geological Observatory, spoke about the Halifax Explosion of 1917 in terms of a seismic event. The 2.6-kt explosion was the largest man-made explosion prior to the detonation of the first atomic bombs. The effective seismic magnitude of the event may have been m, = 2.5-3.0.

  13. CMOS imager for pointing and tracking applications

    NASA Technical Reports Server (NTRS)

    Pain, Bedabrata (Inventor); Sun, Chao (Inventor); Yang, Guang (Inventor); Heynssens, Julie B. (Inventor)

    2006-01-01

    Systems and techniques to realize pointing and tracking applications with CMOS imaging devices. In general, in one implementation, the technique includes: sampling multiple rows and multiple columns of an active pixel sensor array into a memory array (e.g., an on-chip memory array), and reading out the multiple rows and multiple columns sampled in the memory array to provide image data with reduced motion artifact. Various operation modes may be provided, including TDS, CDS, CQS, a tracking mode to read out multiple windows, and/or a mode employing a sample-first-read-later readout scheme. The tracking mode can take advantage of a diagonal switch array. The diagonal switch array, the active pixel sensor array and the memory array can be integrated onto a single imager chip with a controller. This imager device can be part of a larger imaging system for both space-based applications and terrestrial applications.

  14. The CMOS integration of a power inverter

    NASA Astrophysics Data System (ADS)

    Mannarino, Eric Francis

    Due to their falling costs, the use of renewable energy systems is expanding around the world. These systems require the conversion of DC power into grid-synchronous AC power. Currently, the inverters that carry out this task are built using discrete transistors. TowerJazz Semiconductor Corp. has created a commercial CMOS process that allows for blocking voltages of up to 700 V, effectively removing the barrier to integrating power inverters onto a single chip. This thesis explores this process using two topologies. The first is a cell-based switched-capacitor topology first presented by Ke Zou. The second is a novel topology that explores the advantage of using a bused input-output system, as in digital electronics. Simulations run on both topologies confirm the high-efficiency demonstrated in Zou’s process as well as the advantage the bus-based system has in output voltage levels.

  15. A Multipurpose CMOS Platform for Nanosensing

    PubMed Central

    Bonanno, Alberto; Sanginario, Alessandro; Marasso, Simone L.; Miccoli, Beatrice; Bejtka, Katarzyna; Benetto, Simone; Demarchi, Danilo

    2016-01-01

    This paper presents a customizable sensing system based on functionalized nanowires (NWs) assembled onto complementary metal oxide semiconductor (CMOS) technology. The Micro-for-Nano (M4N) chip integrates on top of the electronics an array of aluminum microelectrodes covered with gold by means of a customized electroless plating process. The NW assembly process is driven by an array of on-chip dielectrophoresis (DEP) generators, enabling a custom layout of different nanosensors on the same microelectrode array. The electrical properties of each assembled NW are singularly sensed through an in situ CMOS read-out circuit (ROC) that guarantees a low noise and reliable measurement. The M4N chip is directly connected to an external microcontroller for configuration and data processing. The processed data are then redirected to a workstation for real-time data visualization and storage during sensing experiments. As proof of concept, ZnO nanowires have been integrated onto the M4N chip to validate the approach that enables different kind of sensing experiments. The device has been then irradiated by an external UV source with adjustable power to measure the ZnO sensitivity to UV-light exposure. A maximum variation of about 80% of the ZnO-NW resistance has been detected by the M4N system when the assembled 5 μm × 500 nm single ZnO-NW is exposed to an estimated incident radiant UV-light flux in the range of 1 nW–229 nW. The performed experiments prove the efficiency of the platform conceived for exploiting any kind of material that can change its capacitance and/or resistance due to an external stimulus. PMID:27916911

  16. CMOS image sensor with contour enhancement

    NASA Astrophysics Data System (ADS)

    Meng, Liya; Lai, Xiaofeng; Chen, Kun; Yuan, Xianghui

    2010-10-01

    Imitating the signal acquisition and processing of vertebrate retina, a CMOS image sensor with bionic pre-processing circuit is designed. Integration of signal-process circuit on-chip can reduce the requirement of bandwidth and precision of the subsequent interface circuit, and simplify the design of the computer-vision system. This signal pre-processing circuit consists of adaptive photoreceptor, spatial filtering resistive network and Op-Amp calculation circuit. The adaptive photoreceptor unit with a dynamic range of approximately 100 dB has a good self-adaptability for the transient changes in light intensity instead of intensity level itself. Spatial low-pass filtering resistive network used to mimic the function of horizontal cell, is composed of the horizontal resistor (HRES) circuit and OTA (Operational Transconductance Amplifier) circuit. HRES circuit, imitating dendrite of the neuron cell, comprises of two series MOS transistors operated in weak inversion region. Appending two diode-connected n-channel transistors to a simple transconductance amplifier forms the OTA Op-Amp circuit, which provides stable bias voltage for the gate of MOS transistors in HRES circuit, while serves as an OTA voltage follower to provide input voltage for the network nodes. The Op-Amp calculation circuit with a simple two-stage Op-Amp achieves the image contour enhancing. By adjusting the bias voltage of the resistive network, the smoothing effect can be tuned to change the effect of image's contour enhancement. Simulations of cell circuit and 16×16 2D circuit array are implemented using CSMC 0.5μm DPTM CMOS process.

  17. A Multipurpose CMOS Platform for Nanosensing.

    PubMed

    Bonanno, Alberto; Sanginario, Alessandro; Marasso, Simone L; Miccoli, Beatrice; Bejtka, Katarzyna; Benetto, Simone; Demarchi, Danilo

    2016-11-30

    This paper presents a customizable sensing system based on functionalized nanowires (NWs) assembled onto complementary metal oxide semiconductor (CMOS) technology. The Micro-for-Nano (M4N) chip integrates on top of the electronics an array of aluminum microelectrodes covered with gold by means of a customized electroless plating process. The NW assembly process is driven by an array of on-chip dielectrophoresis (DEP) generators, enabling a custom layout of different nanosensors on the same microelectrode array. The electrical properties of each assembled NW are singularly sensed through an in situ CMOS read-out circuit (ROC) that guarantees a low noise and reliable measurement. The M4N chip is directly connected to an external microcontroller for configuration and data processing. The processed data are then redirected to a workstation for real-time data visualization and storage during sensing experiments. As proof of concept, ZnO nanowires have been integrated onto the M4N chip to validate the approach that enables different kind of sensing experiments. The device has been then irradiated by an external UV source with adjustable power to measure the ZnO sensitivity to UV-light exposure. A maximum variation of about 80% of the ZnO-NW resistance has been detected by the M4N system when the assembled 5 μ m × 500 nm single ZnO-NW is exposed to an estimated incident radiant UV-light flux in the range of 1 nW-229 nW. The performed experiments prove the efficiency of the platform conceived for exploiting any kind of material that can change its capacitance and/or resistance due to an external stimulus.

  18. CMOS Electrochemical Instrumentation for Biosensor Microsystems: A Review

    PubMed Central

    Li, Haitao; Liu, Xiaowen; Li, Lin; Mu, Xiaoyi; Genov, Roman; Mason, Andrew J.

    2016-01-01

    Modern biosensors play a critical role in healthcare and have a quickly growing commercial market. Compared to traditional optical-based sensing, electrochemical biosensors are attractive due to superior performance in response time, cost, complexity and potential for miniaturization. To address the shortcomings of traditional benchtop electrochemical instruments, in recent years, many complementary metal oxide semiconductor (CMOS) instrumentation circuits have been reported for electrochemical biosensors. This paper provides a review and analysis of CMOS electrochemical instrumentation circuits. First, important concepts in electrochemical sensing are presented from an instrumentation point of view. Then, electrochemical instrumentation circuits are organized into functional classes, and reported CMOS circuits are reviewed and analyzed to illuminate design options and performance tradeoffs. Finally, recent trends and challenges toward on-CMOS sensor integration that could enable highly miniaturized electrochemical biosensor microsystems are discussed. The information in the paper can guide next generation electrochemical sensor design. PMID:28042860

  19. CMOS Active Pixel Sensor Technology and Reliability Characterization Methodology

    NASA Technical Reports Server (NTRS)

    Chen, Yuan; Guertin, Steven M.; Pain, Bedabrata; Kayaii, Sammy

    2006-01-01

    This paper describes the technology, design features and reliability characterization methodology of a CMOS Active Pixel Sensor. Both overall chip reliability and pixel reliability are projected for the imagers.

  20. Electronics and photonics convergence on Si CMOS platform

    NASA Astrophysics Data System (ADS)

    Wada, Kazumi

    2004-07-01

    The present paper describes Si microphotonics and its current status of electronics and photonics convergence on Si platform based on monolithic integration using CMOS (Complementary Metal Oxide Semiconductor) technologies. The Si CMOS platform is advantageous over III-V semiconductor based platform because of a short time-lag between basic research and commercialization in terms of the standardized materials and processes. To implement photonic devices on the Si CMOS platform, it is important to reduce materials diversity in current photonics devices. Low loss SiNx waveguides with sharp bends, high performance strained Ge photodetectors for C+L band, and demultiplexer/multiplexer for WDM (wavelength division multiplexing) have been successfully implemented on the Si CMOS platform. The current targets are cost-effective OADMs (optical add-drop multiplexers) for optical communication and optical clocking for Si LSIs beyond Cu-low k technologies.

  1. X-ray tomography using a CMOS area detector

    NASA Astrophysics Data System (ADS)

    Brunetti, A.; Cesareo, R.

    2007-05-01

    A flat panel based on CMOS technology represents a valid alternative to other kinds of flat panels and to ccd detectors for X-ray imaging. Although the spatial resolution of the ccd sensors is better than that of a CMOS sensor, the last has a larger sensitive-area and it can work at room temperature reaching a dynamic performance comparable to that of a cooled ccd sensor. Other kinds of flat panels, such as TFT screen are much more expensive and they have lower spatial resolution and higher noise than the CMOS detector. In this paper, an application of the CMOS sensor to X-ray tomography is described. Preliminary results are reported and discussed.

  2. Monolithic integration of a plasmonic sensor with CMOS technology

    NASA Astrophysics Data System (ADS)

    Shakoor, Abdul; Cheah, Boon C.; Hao, Danni; Al-Rawhani, Mohammed; Nagy, Bence; Grant, James; Dale, Carl; Keegan, Neil; McNeil, Calum; Cumming, David R. S.

    2017-02-01

    Monolithic integration of nanophotonic sensors with CMOS detectors can transform the laboratory based nanophotonic sensors into practical devices with a range of applications in everyday life. In this work, by monolithically integrating an array of gold nanodiscs with the CMOS photodiode we have developed a compact and miniaturized nanophotonic sensor system having direct electrical read out. Doing so eliminates the need of expensive and bulky laboratory based optical spectrum analyzers used currently for measurements of nanophotonic sensor chips. The experimental optical sensitivity of the gold nanodiscs is measured to be 275 nm/RIU which translates to an electrical sensitivity of 5.4 V/RIU. This integration of nanophotonic sensors with the CMOS electronics has the potential to revolutionize personalized medical diagnostics similar to the way in which the CMOS technology has revolutionized the electronics industry.

  3. CMOS Electrochemical Instrumentation for Biosensor Microsystems: A Review.

    PubMed

    Li, Haitao; Liu, Xiaowen; Li, Lin; Mu, Xiaoyi; Genov, Roman; Mason, Andrew J

    2016-12-31

    Modern biosensors play a critical role in healthcare and have a quickly growing commercial market. Compared to traditional optical-based sensing, electrochemical biosensors are attractive due to superior performance in response time, cost, complexity and potential for miniaturization. To address the shortcomings of traditional benchtop electrochemical instruments, in recent years, many complementary metal oxide semiconductor (CMOS) instrumentation circuits have been reported for electrochemical biosensors. This paper provides a review and analysis of CMOS electrochemical instrumentation circuits. First, important concepts in electrochemical sensing are presented from an instrumentation point of view. Then, electrochemical instrumentation circuits are organized into functional classes, and reported CMOS circuits are reviewed and analyzed to illuminate design options and performance tradeoffs. Finally, recent trends and challenges toward on-CMOS sensor integration that could enable highly miniaturized electrochemical biosensor microsystems are discussed. The information in the paper can guide next generation electrochemical sensor design.

  4. Failures Of CMOS Devices At Low Radiation-Dose Rates

    NASA Technical Reports Server (NTRS)

    Goben, Charles A.; Price, William E.

    1990-01-01

    Method for obtaining approximate failure-versus-dose-rate curves derived from experiments on failures of SGS 4007 complementary metal oxide/semiconductor (CMOS) integrated circuits irradiated by Co60 and Cs137 radioactive sources.

  5. Tests of commercial colour CMOS cameras for astronomical applications

    NASA Astrophysics Data System (ADS)

    Pokhvala, S. M.; Reshetnyk, V. M.; Zhilyaev, B. E.

    2013-12-01

    We present some results of testing commercial colour CMOS cameras for astronomical applications. Colour CMOS sensors allow to perform photometry in three filters simultaneously that gives a great advantage compared with monochrome CCD detectors. The Bayer BGR colour system realized in colour CMOS sensors is close to the astronomical Johnson BVR system. The basic camera characteristics: read noise (e^{-}/pix), thermal noise (e^{-}/pix/sec) and electronic gain (e^{-}/ADU) for the commercial digital camera Canon 5D MarkIII are presented. We give the same characteristics for the scientific high performance cooled CCD camera system ALTA E47. Comparing results for tests of Canon 5D MarkIII and CCD ALTA E47 show that present-day commercial colour CMOS cameras can seriously compete with the scientific CCD cameras in deep astronomical imaging.

  6. A safety monitoring system for taxi based on CMOS imager

    NASA Astrophysics Data System (ADS)

    Liu, Zhi

    2005-01-01

    CMOS image sensors now become increasingly competitive with respect to their CCD counterparts, while adding advantages such as no blooming, simpler driving requirements and the potential of on-chip integration of sensor, analogue circuitry, and digital processing functions. A safety monitoring system for taxi based on cmos imager that can record field situation when unusual circumstance happened is described in this paper. The monitoring system is based on a CMOS imager (OV7120), which can output digital image data through parallel pixel data port. The system consists of a CMOS image sensor, a large capacity NAND FLASH ROM, a USB interface chip and a micro controller (AT90S8515). The structure of whole system and the test data is discussed and analyzed in detail.

  7. CMOS serial link for fully duplexed data communication

    NASA Astrophysics Data System (ADS)

    Lee, Kyeongho; Kim, Sungjoon; Ahn, Gijung; Jeong, Deog-Kyoon

    1995-04-01

    This paper describes a CMOS serial link allowing fully duplexed 500 Mbaud serial data communication. The CMOS serial link is a robust and low-cost solution to high data rate requirements. A central charge pump PLL for generating multiphase clocks for oversampling is shared by several serial link channels. Fully duplexed serial data communication is realized in the bidirectional bridge by separating incoming data from the mixed signal on the cable end. The digital PLL accomplishes process-independent data recovery by using a low-ratio oversampling, a majority voting, and a parallel data recovery scheme. Mostly, digital approach could extend its bandwidth further with scaled CMOS technology. A single channel serial link and a charge pump PLL are integrated in a test chip using 1.2 micron CMOS process technology. The test chip confirms upto 500 Mbaud unidirectional mode operation and 320 Mbaud fully duplexed mode operation with pseudo random data patterns.

  8. Delta Doping High Purity CCDs and CMOS for LSST

    NASA Technical Reports Server (NTRS)

    Blacksberg, Jordana; Nikzad, Shouleh; Hoenk, Michael; Elliott, S. Tom; Bebek, Chris; Holland, Steve; Kolbe, Bill

    2006-01-01

    A viewgraph presentation describing delta doping high purity CCD's and CMOS for LSST is shown. The topics include: 1) Overview of JPL s versatile back-surface process for CCDs and CMOS; 2) Application to SNAP and ORION missions; 3) Delta doping as a back-surface electrode for fully depleted LBNL CCDs; 4) Delta doping high purity CCDs for SNAP and ORION; 5) JPL CMP thinning process development; and 6) Antireflection coating process development.

  9. Improved CMOS field isolation using Germaniun/Boron implantation

    SciTech Connect

    Pfiester, J.R.; Alvis, J.R. )

    1988-08-01

    A novel germanium/boron implantation technique for improving the electrical field isolation for high-density CMOS circuits is demonstrated. Germanium implantation causes a reduction in dopant diffusion and segregation during field oxidation and is shown to increase the p-well field threshold voltage by as much as 40 percent with no significant degradation to junction or device performance. Selective germanium implantation with a blanket boron field implant can also improve the electrical field isolation behavior for CMOS circuits.

  10. CMOS front end electronics for the ATLAS muon detector

    SciTech Connect

    Huth, J.; Oliver, J.; Hazen, E.; Shank, J.

    1997-12-31

    An all-CMOS design for an integrated ASD (Amplifier-Shaper-Discriminator) chip for readout of the ATLAS Monitored Drift Tubes (MDTs) is presented. Eight channels of charge-sensitive preamp, two-stage pole/zero shaper, Wilkinson ADC and discriminator with programmable hysteresis are integrated on a single IC. Key elements have been prototyped in 1.2 and 0.5 micron CMOS operating at 5V and 3.3V respectively.

  11. Delta Doping High Purity CCDs and CMOS for LSST

    NASA Technical Reports Server (NTRS)

    Blacksberg, Jordana; Nikzad, Shouleh; Hoenk, Michael; Elliott, S. Tom; Bebek, Chris; Holland, Steve; Kolbe, Bill

    2006-01-01

    A viewgraph presentation describing delta doping high purity CCD's and CMOS for LSST is shown. The topics include: 1) Overview of JPL s versatile back-surface process for CCDs and CMOS; 2) Application to SNAP and ORION missions; 3) Delta doping as a back-surface electrode for fully depleted LBNL CCDs; 4) Delta doping high purity CCDs for SNAP and ORION; 5) JPL CMP thinning process development; and 6) Antireflection coating process development.

  12. CMOS monolithic pixel sensors research and development at LBNL

    NASA Astrophysics Data System (ADS)

    Contarato, D.; Bussat, J.-M.; Denes, P.; Greiner, L.; Kim, T.; Stezelberger, T.; Wieman, H.; Battaglia, M.; Hooberman, B.; Tompkins, L.

    2007-12-01

    This paper summarizes the recent progress in the design and characterization of CMOS pixel sensors at LBNL. Results of lab tests, beam tests and radiation hardness tests carried out at LBNL on a test structure with pixels of various sizes are reported. The first results of the characterization of back-thinned CMOS pixel sensors are also reported, and future plans and activities are discussed.

  13. Modeling and simulation of TDI CMOS image sensors

    NASA Astrophysics Data System (ADS)

    Nie, Kai-ming; Yao, Su-ying; Xu, Jiang-tao; Gao, Jing

    2013-09-01

    In this paper, a mathematical model of TDI CMOS image sensors was established in behavioral level through MATLAB based on the principle of a TDI CMOS image sensor using temporal oversampling rolling shutter in the along-track direction. The geometric perspective and light energy transmission relationships between the scene and the image on the sensor are included in the proposed model. A graphical user interface (GUI) of the model was also established. A high resolution satellitic picture was used to model the virtual scene being photographed. The effectiveness of the proposed model was verified by computer simulations based on the satellitic picture. In order to guide the design of TDI CMOS image sensors, the impacts of some parameters of TDI CMOS image sensors including pixel pitch, pixel photosensitive size, and integration time on the performance of the sensors were researched through the proposed model. The impacts of the above parameters on the sensors were quantified by sensor's modulation transfer function (MTF) of the along-track direction, which was calculated by slanted-edge method. The simulation results indicated that the TDI CMOS image sensor can get a better performance with smaller pixel photosensitive size and shorter integration time. The proposed model is useful in the process of researching and developing a TDI CMOS image sensor.

  14. Surface enhanced biodetection on a CMOS biosensor chip

    NASA Astrophysics Data System (ADS)

    Belloni, Federico; Sandeau, Laure; Contié, Sylvain; Vicaire, Florence; Owens, Roisin; Rigneault, Hervé

    2012-03-01

    We present a rigorous electromagnetic theory of the electromagnetic power emitted by a dipole located in the vicinity of a multilayer stack. We applied this formalism to a luminescent molecule attached to a CMOS photodiode surface and report light collection efficiency larger than 80% toward the CMOS silicon substrate. We applied this result to the development of a low-cost, simple, portable device based on CMOS photodiodes technology for the detection and quantification of biological targets through light detection, presenting high sensitivity, multiplex ability, and fast data processing. The key feature of our approach is to perform the analytical test directly on the CMOS sensor surface, improving dramatically the optical detection of the molecule emitted light into the high refractive index semiconductor CMOS material. Based on adequate surface chemistry modifications, probe spotting and micro-fluidics, we performed proof-of-concept bio-assays directed against typical immuno-markers (TNF-α and IFN-γ). We compared the developed CMOS chip with a commercial micro-plate reader and found similar intrinsic sensitivities in the pg/ml range.

  15. Advancement of CMOS Doping Technology in an External Development Framework

    NASA Astrophysics Data System (ADS)

    Jain, Amitabh; Chambers, James J.; Shaw, Judy B.

    2011-01-01

    The consumer appetite for a rich multimedia experience drives technology development for mobile hand-held devices and the infrastructure to support them. Enhancements in functionality, speed, and user experience are derived from advancements in CMOS technology. The technical challenges in developing each successive CMOS technology node to support these enhancements have become increasingly difficult. These trends have motivated the CMOS business towards a collaborative approach based on strategic partnerships. This paper describes our model and experience of CMOS development, based on multi-dimensional industrial and academic partnerships. We provide to our process equipment, materials, and simulation partners, as well as to our silicon foundry partners, the detailed requirements for future integrated circuit products. This is done very early in the development cycle to ensure that these requirements can be met. In order to determine these fundamental requirements, we rely on a strategy that requires strong interaction between process and device simulation, physical and chemical analytical methods, and research at academic institutions. This learning is shared with each project partner to address integration and manufacturing issues encountered during CMOS technology development from its inception through product ramp. We utilize TI's core strengths in physical analysis, unit processes and integration, yield ramp, reliability, and product engineering to support this technological development. Finally, this paper presents examples of the advancement of CMOS doping technology for the 28 nm node and beyond through this development model.

  16. An RF energy harvester system using UHF micropower CMOS rectifier based on a diode connected CMOS transistor.

    PubMed

    Shokrani, Mohammad Reza; Khoddam, Mojtaba; Hamidon, Mohd Nizar B; Kamsani, Noor Ain; Rokhani, Fakhrul Zaman; Shafie, Suhaidi Bin

    2014-01-01

    This paper presents a new type diode connected MOS transistor to improve CMOS conventional rectifier's performance in RF energy harvester systems for wireless sensor networks in which the circuits are designed in 0.18  μm TSMC CMOS technology. The proposed diode connected MOS transistor uses a new bulk connection which leads to reduction in the threshold voltage and leakage current; therefore, it contributes to increment of the rectifier's output voltage, output current, and efficiency when it is well important in the conventional CMOS rectifiers. The design technique for the rectifiers is explained and a matching network has been proposed to increase the sensitivity of the proposed rectifier. Five-stage rectifier with a matching network is proposed based on the optimization. The simulation results shows 18.2% improvement in the efficiency of the rectifier circuit and increase in sensitivity of RF energy harvester circuit. All circuits are designed in 0.18 μm TSMC CMOS technology.

  17. Integration of III-V materials and Si-CMOS through double layer transfer process

    NASA Astrophysics Data System (ADS)

    Lee, Kwang Hong; Bao, Shuyu; Fitzgerald, Eugene; Tan, Chuan Seng

    2015-03-01

    A method to integrate III-V compound semiconductor and SOI-CMOS on a common Si substrate is demonstrated. The SOI-CMOS layer is temporarily bonded on a Si handle wafer. Another III-V/Si substrate is then bonded to the SOI-CMOS containing handle wafer. Finally, the handle wafer is released to realize the SOI-CMOS on III-V/Si hybrid structure on a common substrate. Through this method, high temperature III-V materials growth can be completed without the presence of the temperature sensitive CMOS layer, hence damage to the CMOS layer is avoided.

  18. Multiband CMOS sensor simplify FPA design

    NASA Astrophysics Data System (ADS)

    Wang, Weng Lyang B.; Ling, Jer

    2015-10-01

    Push broom multi-band Focal Plane Array (FPA) design needs to consider optics, image sensor, electronic, mechanic as well as thermal. Conventional FPA use two or several CCD device as an image sensor. The CCD image sensor requires several high speed, high voltage and high current clock drivers as well as analog video processors to support their operation. Signal needs to digitize using external sample / hold and digitized circuit. These support circuits are bulky, consume a lot of power, must be shielded and placed in close to the CCD to minimize the introduction of unwanted noise. The CCD also needs to consider how to dissipate power. The end result is a very complicated FPA and hard to make due to more weighs and draws more power requiring complex heat transfer mechanisms. In this paper, we integrate microelectronic technology and multi-layer soft / hard Printed Circuit Board (PCB) technology to design electronic portion. Since its simplicity and integration, the optics, mechanic, structure and thermal design will become very simple. The whole FPA assembly and dis-assembly reduced to a few days. A multi-band CMOS Sensor (dedicated as C468) was used for this design. The CMOS Sensor, allow for the incorporation of clock drivers, timing generators, signal processing and digitization onto the same Integrated Circuit (IC) as the image sensor arrays. This keeps noise to a minimum while providing high functionality at reasonable power levels. The C468 is a first Multiple System-On-Chip (MSOC) IC. This device used our proprietary wafer butting technology and MSOC technology to combine five long sensor arrays into a size of 120 mm x 23.2 mm and 155 mm x 60 mm for chip and package, respectively. The device composed of one Panchromatic (PAN) and four different Multi- Spectral (MS) sensors. Due to its integration on the electronic design, a lot of room is clear for the thermal design. The optical and mechanical design is become very straight forward. The flight model FPA

  19. On noise in time-delay integration CMOS image sensors

    NASA Astrophysics Data System (ADS)

    Levski, Deyan; Choubey, Bhaskar

    2016-05-01

    Time delay integration sensors are of increasing interest in CMOS processes owing to their low cost, power and ability to integrate with other circuit readout blocks. This paper presents an analysis of the noise contributors in current day CMOS Time-Delay-Integration image sensors with various readout architectures. An analysis of charge versus voltage domain readout modes is presented, followed by a noise classification of the existing Analog Accumulator Readout (AAR) and Digital Accumulator Readout (DAR) schemes for TDI imaging. The analysis and classification of existing readout schemes include, pipelined charge transfer, buffered direct injection, voltage as well as current-mode analog accumulators and all-digital accumulator techniques. Time-Delay-Integration imaging modes in CMOS processes typically use an N-number of readout steps, equivalent to the number of TDI pixel stages. In CMOS TDI sensors, where voltage domain readout is used, the requirements over speed and noise of the ADC readout chain are increased due to accumulation of the dominant voltage readout and ADC noise with every stage N. Until this day, the latter is the primary reason for a leap-back of CMOS TDI sensors as compared to their CCD counterparts. Moreover, most commercial CMOS TDI implementations are still based on a charge-domain readout, mimicking a CCD-like operation mode. Thus, having a good understanding of each noise contributor in the signal chain, as well as its magnitude in different readout architectures, is vital for the design of future generation low-noise CMOS TDI image sensors based on a voltage domain readout. This paper gives a quantitative classification of all major noise sources for all popular implementations in the literature.

  20. Monolithic CMUT-on-CMOS integration for intravascular ultrasound applications.

    PubMed

    Zahorian, Jaime; Hochman, Michael; Xu, Toby; Satir, Sarp; Gurun, Gokce; Karaman, Mustafa; Degertekin, F Levent

    2011-12-01

    One of the most important promises of capacitive micromachined ultrasonic transducer (CMUT) technology is integration with electronics. This approach is required to minimize the parasitic capacitances in the receive mode, especially in catheter-based volumetric imaging arrays, for which the elements must be small. Furthermore, optimization of the available silicon area and minimized number of connections occurs when the CMUTs are fabricated directly above the associated electronics. Here, we describe successful fabrication and performance evaluation of CMUT arrays for intravascular imaging on custom-designed CMOS receiver electronics from a commercial IC foundry. The CMUT-on-CMOS process starts with surface isolation and mechanical planarization of the CMOS electronics to reduce topography. The rest of the CMUT fabrication is achieved by modifying a low-temperature micromachining process through the addition of a single mask and developing a dry etching step to produce sloped sidewalls for simple and reliable CMUT-to-CMOS interconnection. This CMUT-to-CMOS interconnect method reduced the parasitic capacitance by a factor of 200 when compared with a standard wire-bonding method. Characterization experiments indicate that the CMUT-on-CMOS elements are uniform in frequency response and are similar to CMUTs simultaneously fabricated on standard silicon wafers without electronics integration. Ex- periments on a 1.6-mm-diameter dual-ring CMUT array with a center frequency of 15 MHz show that both the CMUTs and the integrated CMOS electronics are fully functional. The SNR measurements indicate that the performance is adequate for imaging chronic total occlusions located 1 cm from the CMUT array.

  1. NSC 800, 8-bit CMOS microprocessor

    NASA Technical Reports Server (NTRS)

    Suszko, S. F.

    1984-01-01

    The NSC 800 is an 8-bit CMOS microprocessor manufactured by National Semiconductor Corp., Santa Clara, California. The 8-bit microprocessor chip with 40-pad pin-terminals has eight address buffers (A8-A15), eight data address -- I/O buffers (AD(sub 0)-AD(sub 7)), six interrupt controls and sixteen timing controls with a chip clock generator and an 8-bit dynamic RAM refresh circuit. The 22 internal registers have the capability of addressing 64K bytes of memory and 256 I/O devices. The chip is fabricated on N-type (100) silicon using self-aligned polysilicon gates and local oxidation process technology. The chip interconnect consists of four levels: Aluminum, Polysi 2, Polysi 1, and P(+) and N(+) diffusions. The four levels, except for contact interface, are isolated by interlevel oxide. The chip is packaged in a 40-pin dual-in-line (DIP), side brazed, hermetically sealed, ceramic package with a metal lid. The operating voltage for the device is 5 V. It is available in three operating temperature ranges: 0 to +70 C, -40 to +85 C, and -55 to +125 C. Two devices were submitted for product evaluation by F. Stott, MTS, JPL Microprocessor Specialist. The devices were pencil-marked and photographed for identification.

  2. Simulation of SEU transients in CMOS ICs

    SciTech Connect

    Kaul, N.; Bhuva, B.L.; Kerns, S.E. )

    1991-12-01

    This paper reports that available analytical models of the number of single-event-induced errors (SEU) in combinational logic systems are not easily applicable to real integrated circuits (ICs). An efficient computer simulation algorithm set, SITA, predicts the vulnerability of data stored in and processed by complex combinational logic circuits to SEU. SITA is described in detail to allow researchers to incorporate it into their error analysis packages. Required simulation algorithms are based on approximate closed-form equations modeling individual device behavior in CMOS logic units. Device-level simulation is used to estimate the probability that ion-device interactions produce erroneous signals capable of propagating to a latch (or n output node), and logic-level simulation to predict the spread of such erroneous, latched information through the IC. Simulation results are compared to those from SPICE for several circuit and logic configurations. SITA results are comparable to this established circuit-level code, and SITA can analyze circuits with state-of-the-art device densities (which SPICE cannot). At all IC complexity levels, SITAS offers several factors of 10 savings in simulation time over SPICE.

  3. CMOS SiPM with integrated amplifier

    NASA Astrophysics Data System (ADS)

    Schwinger, Alexander; Brockherde, Werner; Hosticka, Bedrich J.; Vogt, Holger

    2017-02-01

    The integration of silicon photomultiplier (SiPM) and frontend electronics in a suitable optoelectronic CMOS process is a promising approach to increase the versatility of single-photon avalanche diode (SPAD)-based singlephoton detectors. By integrating readout amplifiers, the device output capacitance can be reduced to minimize the waveform tail, which is especially important for large area detectors (>10 × 10mm2). Possible architectures include a single readout amplifier for the whole detector, which reduces the output capacitance to 1:1 pF at minimal reduction in detector active area. On the other hand, including a readout amplifier in every SiPM cell would greatly improve the total output capacitance by minimizing the influence of metal routing parasitic capacitance, but requiring a prohibitive amount of detector area. As tradeoff, the proposed detector features one readout amplifier for each column of the detector matrix to allow for a moderate reduction in output capacitance while allowing the electronics to be placed in the periphery of the active detector area. The presented detector with a total size of 1.7 ♢ 1.0mm2 features 400 cells with a 50 μm pitch, where the signal of each column of 20 SiPM cells is summed in a readout channel. The 20 readout channels are subsequently summed into one output channel, to allow the device to be used as a drop-in replacement for commonly used analog SiPMs.

  4. Photonic circuits integrated with CMOS compatible photodetectors

    NASA Astrophysics Data System (ADS)

    Cristea, Dana; Craciunoiu, F.; Modreanu, M.; Caldararu, M.; Cernica, I.

    2001-06-01

    This paper presents the integration of photodetectors and photonic circuits (waveguides and interferometers, coupling elements and chemo-optical transducing layer) on one silicon chip. Different materials: silicon, doped or undoped silica, SiO xN y, polymers, and different technologies: LPCVD, APCVD, sol-gel, spinning, micromachining have been used to realize the photonic and micromechanical components and the transducers. Also, MOS compatible processes have been used for optoelectronic circuits. The attention was focused on the matching of all the involved technologies, to allow the monolithic integration of all components, and also on the design and fabrication of special structures of photodetectors. Two types of high responsivity photodetectors, a photo-FET and a bipolar NPN phototransistor, with modified structures that allow the optical coupling to the waveguides have been designed and experimented. An original 3-D model was developed for the system: opto-FET-coupler-waveguide. A test circuit for sensor applications was experimented. All the components of the test circuits, photodetectors, waveguides, couplers, were obtained using CMOS-compatible processes. The aim of our research activity was to obtain microsensors with optical read-out.

  5. A 5.8nW, 45ppm/°C On-Chip CMOS Wake-up Timer Using a Constant Charge Subtraction Scheme.

    PubMed

    Jeong, Seokhyeon; Lee, Inhee; Blaauw, David; Sylvester, Dennis

    2014-09-01

    This work presents an ultra-low power oscillator designed for wake-up timers in compact wireless sensors. A constant charge subtraction scheme removes continuous comparator delay from the oscillation period, which is the source of temperature dependence in conventional RC relaxation oscillators. This relaxes comparator design constraints, enabling low power operation. In 0.18µm CMOS, the oscillator consumes 5.8nW at room temperature with temperature stability of 45ppm/°C (-10°C to 90°C) and 1%V line sensitivity.

  6. Design and Fabrication of Vertically-Integrated CMOS Image Sensors

    PubMed Central

    Skorka, Orit; Joseph, Dileepan

    2011-01-01

    Technologies to fabricate integrated circuits (IC) with 3D structures are an emerging trend in IC design. They are based on vertical stacking of active components to form heterogeneous microsystems. Electronic image sensors will benefit from these technologies because they allow increased pixel-level data processing and device optimization. This paper covers general principles in the design of vertically-integrated (VI) CMOS image sensors that are fabricated by flip-chip bonding. These sensors are composed of a CMOS die and a photodetector die. As a specific example, the paper presents a VI-CMOS image sensor that was designed at the University of Alberta, and fabricated with the help of CMC Microsystems and Micralyne Inc. To realize prototypes, CMOS dies with logarithmic active pixels were prepared in a commercial process, and photodetector dies with metal-semiconductor-metal devices were prepared in a custom process using hydrogenated amorphous silicon. The paper also describes a digital camera that was developed to test the prototype. In this camera, scenes captured by the image sensor are read using an FPGA board, and sent in real time to a PC over USB for data processing and display. Experimental results show that the VI-CMOS prototype has a higher dynamic range and a lower dark limit than conventional electronic image sensors. PMID:22163860

  7. High-speed CMOS optical communication using silicon light emitters

    NASA Astrophysics Data System (ADS)

    Goosen, Marius E.; Venter, Petrus J.; du Plessis, Monuko; Nell, Ilse J.; Bogalecki, Alfons W.; Rademeyer, Pieter

    2011-01-01

    The idea of moving CMOS into the mainstream optical domain remains an attractive one. In this paper we discuss our recent advances towards a complete silicon optical communication solution. We prove that transmission of baseband data at multiples of megabits per second rates are possible using improved silicon light sources in a completely native standard CMOS process with no post processing. The CMOS die is aligned to a fiber end and the light sources are directly modulated. An optical signal is generated and transmitted to a silicon Avalanche Photodiode (APD) module, received and recovered. Signal detectability is proven through eye diagram measurements. The results show an improvement of more than tenfold over our previous results, also demonstrating the fastest optical communication from standard CMOS light sources. This paper presents an all silicon optical data link capable of 2 Mb/s at a bit error rate of 10-10, or alternatively 1 Mb/s at a bit error rate of 10-14. As the devices are not operating at their intrinsic switching speed limit, we believe that even higher transmission rates are possible with complete integration of all components in CMOS.

  8. Figures of merit for CMOS SPADs and arrays

    NASA Astrophysics Data System (ADS)

    Bronzi, D.; Villa, F.; Bellisai, S.; Tisa, S.; Ripamonti, G.; Tosi, A.

    2013-05-01

    SPADs (Single Photon Avalanche Diodes) are emerging as most suitable photodetectors for both single-photon counting (Fluorescence Correlation Spectroscopy, Lock-in 3D Ranging) and single-photon timing (Lidar, Fluorescence Lifetime Imaging, Diffuse Optical Imaging) applications. Different complementary metal-oxide semiconductor (CMOS) implementations have been reported in literature. We present some figure of merit able to summarize the typical SPAD performances (i.e. Dark Counting Rate, Photo Detection Efficiency, afterpulsing probability, hold-off time, timing jitter) and to identify a proper metric for SPAD comparison, both as single detectors and also as imaging arrays. The goal is to define a practical framework within which it is possible to rank detectors based on their performances in specific experimental conditions, for either photon-counting or photon-timing applications. Furthermore we review the performances of some CMOS and custom-made SPADs. Results show that CMOS SPADs performances improve as the technology scales down; moreover, miniaturization of SPADs and new solutions adopted to counteract issues related with the SPAD design (electric field uniformity, premature edge breakdown, tunneling effects, defect-rich STI interface) along with advances in standard CMOS processes led to a general improvement in all fabricated photodetectors; therefore, CMOS SPADs can be suitable for very dense and cost-effective many-pixels imagers with high performances.

  9. Improved Space Object Observation Techniques Using CMOS Detectors

    NASA Astrophysics Data System (ADS)

    Schildknecht, T.; Hinze, A.; Schlatter, P.; Silha, J.; Peltonen, J.; Santti, T.; Flohrer, T.

    2013-08-01

    CMOS-sensors, or in general Active Pixel Sensors (APS), are rapidly replacing CCDs in the consumer camera market. Due to significant technological advances during the past years these devices start to compete with CCDs also for demanding scientific imaging applications, in particular in the astronomy community. CMOS detectors offer a series of inherent advantages compared to CCDs, due to the structure of their basic pixel cells, which each contain their own amplifier and readout electronics. The most prominent advantages for space object observations are the extremely fast and flexible readout capabilities, feasibility for electronic shuttering and precise epoch registration, and the potential to perform image processing operations on-chip and in real-time. Presently applied and proposed optical observation strategies for space debris surveys and space surveillance applications had to be analyzed. The major design drivers were identified and potential benefits from using available and future CMOS sensors were assessed. The major challenges and design drivers for ground-based and space-based optical observation strategies have been analyzed. CMOS detector characteristics were critically evaluated and compared with the established CCD technology, especially with respect to the above mentioned observations. Similarly, the desirable on-chip processing functionalities which would further enhance the object detection and image segmentation were identified. Finally, the characteristics of a particular CMOS sensor available at the Zimmerwald observatory were analyzed by performing laboratory test measurements.

  10. CMOS Imaging Sensor Technology for Aerial Mapping Cameras

    NASA Astrophysics Data System (ADS)

    Neumann, Klaus; Welzenbach, Martin; Timm, Martin

    2016-06-01

    In June 2015 Leica Geosystems launched the first large format aerial mapping camera using CMOS sensor technology, the Leica DMC III. This paper describes the motivation to change from CCD sensor technology to CMOS for the development of this new aerial mapping camera. In 2002 the DMC first generation was developed by Z/I Imaging. It was the first large format digital frame sensor designed for mapping applications. In 2009 Z/I Imaging designed the DMC II which was the first digital aerial mapping camera using a single ultra large CCD sensor to avoid stitching of smaller CCDs. The DMC III is now the third generation of large format frame sensor developed by Z/I Imaging and Leica Geosystems for the DMC camera family. It is an evolution of the DMC II using the same system design with one large monolithic PAN sensor and four multi spectral camera heads for R,G, B and NIR. For the first time a 391 Megapixel large CMOS sensor had been used as PAN chromatic sensor, which is an industry record. Along with CMOS technology goes a range of technical benefits. The dynamic range of the CMOS sensor is approx. twice the range of a comparable CCD sensor and the signal to noise ratio is significantly better than with CCDs. Finally results from the first DMC III customer installations and test flights will be presented and compared with other CCD based aerial sensors.

  11. Silicon CMOS-based vertical multimode interference optical taps

    NASA Astrophysics Data System (ADS)

    Stenger, Vincent E.; Beyette, Fred R., Jr.

    2001-12-01

    A compact, low loss, optical tap technology is critical for the incorporation of optical interconnects into mainstream CMOS processes. A recently introduced multimode interference effect based device has the potential for very high speed performance in a compact geometry and in a CMOS compatible process. For this work, 2-D and 3-D device simulations confirm a low excess optical loss on order of 0.1 dB, and a nominal 40% (2.2 dB) optical coupling into the CMOS circuitry over a wide range of guide to substrate distances. Simulated devices are on the order of 25micrometers in length and as narrow as 1 um. High temperature, hybrid polymer materials used for commercial CMOS inter-metal dielectric layers are targeted for tap fabrication and are incorporated into the models. Low cost, silicon CMOS based processing makes the new tap technology especially suitable for computer multi-chip module and board level interconnects, as well as for metro fiber to the home and desk telecommunications applications.

  12. CMOS Cell Sensors for Point-of-Care Diagnostics

    PubMed Central

    Adiguzel, Yekbun; Kulah, Haluk

    2012-01-01

    The burden of health-care related services in a global era with continuously increasing population and inefficient dissipation of the resources requires effective solutions. From this perspective, point-of-care diagnostics is a demanded field in clinics. It is also necessary both for prompt diagnosis and for providing health services evenly throughout the population, including the rural districts. The requirements can only be fulfilled by technologies whose productivity has already been proven, such as complementary metal-oxide-semiconductors (CMOS). CMOS-based products can enable clinical tests in a fast, simple, safe, and reliable manner, with improved sensitivities. Portability due to diminished sensor dimensions and compactness of the test set-ups, along with low sample and power consumption, is another vital feature. CMOS-based sensors for cell studies have the potential to become essential counterparts of point-of-care diagnostics technologies. Hence, this review attempts to inform on the sensors fabricated with CMOS technology for point-of-care diagnostic studies, with a focus on CMOS image sensors and capacitance sensors for cell studies. PMID:23112587

  13. Design and fabrication of vertically-integrated CMOS image sensors.

    PubMed

    Skorka, Orit; Joseph, Dileepan

    2011-01-01

    Technologies to fabricate integrated circuits (IC) with 3D structures are an emerging trend in IC design. They are based on vertical stacking of active components to form heterogeneous microsystems. Electronic image sensors will benefit from these technologies because they allow increased pixel-level data processing and device optimization. This paper covers general principles in the design of vertically-integrated (VI) CMOS image sensors that are fabricated by flip-chip bonding. These sensors are composed of a CMOS die and a photodetector die. As a specific example, the paper presents a VI-CMOS image sensor that was designed at the University of Alberta, and fabricated with the help of CMC Microsystems and Micralyne Inc. To realize prototypes, CMOS dies with logarithmic active pixels were prepared in a commercial process, and photodetector dies with metal-semiconductor-metal devices were prepared in a custom process using hydrogenated amorphous silicon. The paper also describes a digital camera that was developed to test the prototype. In this camera, scenes captured by the image sensor are read using an FPGA board, and sent in real time to a PC over USB for data processing and display. Experimental results show that the VI-CMOS prototype has a higher dynamic range and a lower dark limit than conventional electronic image sensors.

  14. CMOS cell sensors for point-of-care diagnostics.

    PubMed

    Adiguzel, Yekbun; Kulah, Haluk

    2012-01-01

    The burden of health-care related services in a global era with continuously increasing population and inefficient dissipation of the resources requires effective solutions. From this perspective, point-of-care diagnostics is a demanded field in clinics. It is also necessary both for prompt diagnosis and for providing health services evenly throughout the population, including the rural districts. The requirements can only be fulfilled by technologies whose productivity has already been proven, such as complementary metal-oxide-semiconductors (CMOS). CMOS-based products can enable clinical tests in a fast, simple, safe, and reliable manner, with improved sensitivities. Portability due to diminished sensor dimensions and compactness of the test set-ups, along with low sample and power consumption, is another vital feature. CMOS-based sensors for cell studies have the potential to become essential counterparts of point-of-care diagnostics technologies. Hence, this review attempts to inform on the sensors fabricated with CMOS technology for point-of-care diagnostic studies, with a focus on CMOS image sensors and capacitance sensors for cell studies.

  15. CMOS Conductometric System for Growth Monitoring and Sensing of Bacteria.

    PubMed

    Lei Yao; Lamarche, P; Tawil, N; Khan, R; Aliakbar, A M; Hassan, M H; Chodavarapu, V P; Mandeville, R

    2011-06-01

    We present the design and implementation of a prototype complementary metal-oxide semiconductor (CMOS) conductometric integrated circuit (IC) for colony growth monitoring and specific sensing of Escherichia coli (E. coli) bacteria. The detection of E. coli is done by employing T4 bacteriophages as receptor organisms. The conductometric system operates by measuring the resistance of the test sample between the electrodes of a two-electrode electrochemical system (reference electrode and working electrode). The CMOS IC is fabricated in a TSMC 0.35-μm process and uses a current-to-frequency (I to F) conversion circuit to convert the test sample resistance into a digital output modulated in frequency. Pulsewidth control (one-shot circuit) is implemented on-chip to control the pulsewidth of the output digital signal. The novelty in the current work lies in the ability of the CMOS sensor system to monitor very low initial concentrations of bacteria (4×10(2) to 4×10(4) colony forming unit (CFU)/mL). The CMOS system is also used to record the interaction between E. coli and its specific receptor T4 bacteriophage. The prototype CMOS IC consumes an average power of 1.85 mW with a 3.3-V dc power supply.

  16. 77 FR 74513 - Certain CMOS Image Sensors and Products Containing Same; Investigations: Terminations...

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-12-14

    ... From the Federal Register Online via the Government Publishing Office INTERNATIONAL TRADE COMMISSION Certain CMOS Image Sensors and Products Containing Same; Investigations: Terminations... importation, and the sale within the United States after importation of certain CMOS image sensors and...

  17. Radiation tolerant back biased CMOS VLSI

    NASA Technical Reports Server (NTRS)

    Maki, Gary K. (Inventor); Gambles, Jody W. (Inventor); Hass, Kenneth J. (Inventor)

    2003-01-01

    A CMOS circuit formed in a semiconductor substrate having improved immunity to total ionizing dose radiation, improved immunity to radiation induced latch up, and improved immunity to a single event upset. The architecture of the present invention can be utilized with the n-well, p-well, or dual-well processes. For example, a preferred embodiment of the present invention is described relative to a p-well process wherein the p-well is formed in an n-type substrate. A network of NMOS transistors is formed in the p-well, and a network of PMOS transistors is formed in the n-type substrate. A contact is electrically coupled to the p-well region and is coupled to first means for independently controlling the voltage in the p-well region. Another contact is electrically coupled to the n-type substrate and is coupled to second means for independently controlling the voltage in the n-type substrate. By controlling the p-well voltage, the effective threshold voltages of the n-channel transistors both drawn and parasitic can be dynamically tuned. Likewise, by controlling the n-type substrate, the effective threshold voltages of the p-channel transistors both drawn and parasitic can also be dynamically tuned. Preferably, by optimizing the threshold voltages of the n-channel and p-channel transistors, the total ionizing dose radiation effect will be neutralized and lower supply voltages can be utilized for the circuit which would result in the circuit requiring less power.

  18. Adiabatic circuits: converter for static CMOS signals

    NASA Astrophysics Data System (ADS)

    Fischer, J.; Amirante, E.; Bargagli-Stoffi, A.; Schmitt-Landsiedel, D.

    2003-05-01

    Ultra low power applications can take great advantages from adiabatic circuitry. In this technique a multiphase system is used which consists ideally of trapezoidal voltage signals. The input signals to be processed will often come from a function block realized in static CMOS. The static rectangular signals must be converted for the oscillating multiphase system of the adiabatic circuitry. This work shows how to convert the input signals to the proposed pulse form which is synchronized to the appropriate supply voltage. By means of adder structures designed for a 0.13µm technology in a 4-phase system there will be demonstrated, which additional circuits are necessary for the conversion. It must be taken into account whether the data arrive in parallel or serial form. Parallel data are all in one phase and therefore it is advantageous to use an adder structure with a proper input stage, e.g. a Carry Lookahead Adder (CLA). With a serial input stage it is possible to read and to process four signals during one cycle due to the adiabatic 4-phase system. Therefore input signals with a frequency four times higher than the adiabatic clock frequency can be used. This reduces the disadvantage of the slow clock period typical for adiabatic circuits. By means of an 8 bit Ripple Carry Adder (8 bit RCA) the serial reading will be introduced. If the word width is larger than 4 bits the word can be divided in 4 bit words which are processed in parallel. This is the most efficient way to minimize the number of input lines and pads. At the same time a high throughput is achieved.

  19. ESD protection design for advanced CMOS

    NASA Astrophysics Data System (ADS)

    Huang, Jin B.; Wang, Gewen

    2001-10-01

    ESD effects in integrated circuits have become a major concern as today's technologies shrink to sub-micron/deep- sub-micron dimensions. The thinner gate oxide and shallower junction depth used in the advanced technologies make them very vulnerable to ESD damages. The advanced techniques like silicidation and STI (shallow trench insulation) used for improving other device performances make ESD design even more challenging. For non-silicided technologies, a certain DCGS (drain contact to gate edge spacing) is needed to achieve ESD hardness for nMOS output drivers and nMOS protection transistors. The typical DCGS values are 4-5um and 2-3um for 0.5um and 0.25um CMOS, respectively. The silicidation reduces the ballast resistance provided by DCGS with at least a factor of 10. As a result, scaling of the ESD performance with device width is lost and even zero ESD performance is reported for standard silicided devices. The device level ESD design is focused in this paper, which includes GGNMOS (gate grounded NMOS) and GCNMOS (gate coupled NMOS). The device level ESD testing including TLP (transmission line pulse) is given. Several ESD issues caused by advanced technologies have been pointed out. The possible solutions have been developed and summarized including silicide blocking, process optimization, back-end ballasting, and new protection scheme, dummy gate/n-well resistor ballsting, etc. Some of them require process cost increase, and others provide novel, compact, and simple design but involving royalty/IP (intellectual property) issue. Circuit level ESD design and layout design considerations are covered. The top-level ESD protection strategies are also given.

  20. Silicon pixel detector prototyping in SOI CMOS technology

    NASA Astrophysics Data System (ADS)

    Dasgupta, Roma; Bugiel, Szymon; Idzik, Marek; Kapusta, Piotr; Kucewicz, Wojciech; Turala, Michal

    2016-12-01

    The Silicon-On-Insulator (SOI) CMOS is one of the most advanced and promising technology for monolithic pixel detectors design. The insulator layer that is implemented inside the silicon crystal allows to integrate sensors matrix and readout electronic on a single wafer. Moreover, the separation of electronic and substrate increases also the SOI circuits performance. The parasitic capacitances to substrate are significantly reduced, so the electronic systems are faster and consume much less power. The authors of this presentation are the members of international SOIPIX collaboration, that is developing SOI pixel detectors in 200 nm Lapis Fully-Depleted, Low-Leakage SOI CMOS. This work shows a set of advantages of SOI technology and presents possibilities for pixel detector design SOI CMOS. In particular, the preliminary results of a Cracow chip are presented.

  1. Radiation imaging with a new scintillator and a CMOS camera

    NASA Astrophysics Data System (ADS)

    Kurosawa, S.; Shoji, Y.; Pejchal, J.; Yokota, Y.; Yoshikawa, A.

    2014-07-01

    A new imaging system consisting of a high-sensitivity complementary metal-oxide semiconductor (CMOS) sensor, a microscope and a new scintillator, Ce-doped Gd3(Al,Ga)5O12 (Ce:GAGG) grown by the Czochralski process, has been developed. The noise, the dark current and the sensitivity of the CMOS camera (ORCA-Flash4.0, Hamamatsu) was revised and compared to a conventional CMOS, whose sensitivity is at the same level as that of a charge coupled device (CCD) camera. Without the scintillator, this system had a good position resolution of 2.1 ± 0.4 μm and we succeeded in obtaining the alpha-ray images using 1-mm thick Ce:GAGG crystal. This system can be applied for example to high energy X-ray beam profile monitor, etc.

  2. A CMOS Humidity Sensor for Passive RFID Sensing Applications

    PubMed Central

    Deng, Fangming; He, Yigang; Zhang, Chaolong; Feng, Wei

    2014-01-01

    This paper presents a low-cost low-power CMOS humidity sensor for passive RFID sensing applications. The humidity sensing element is implemented in standard CMOS technology without any further post-processing, which results in low fabrication costs. The interface of this humidity sensor employs a PLL-based architecture transferring sensor signal processing from the voltage domain to the frequency domain. Therefore this architecture allows the use of a fully digital circuit, which can operate on ultra-low supply voltage and thus achieves low-power consumption. The proposed humidity sensor has been fabricated in the TSMC 0.18 μm CMOS process. The measurements show this humidity sensor exhibits excellent linearity and stability within the relative humidity range. The sensor interface circuit consumes only 1.05 μW at 0.5 V supply voltage and reduces it at least by an order of magnitude compared to previous designs. PMID:24841250

  3. IGBT scaling principle toward CMOS compatible wafer processes

    NASA Astrophysics Data System (ADS)

    Tanaka, Masahiro; Omura, Ichiro

    2013-02-01

    A scaling principle for trench gate IGBT is proposed. CMOS technology on large diameter wafer enables to produce various digital circuits with higher performance and lower cost. The transistor cell structure becomes laterally smaller and smaller and vertically shallower and shallower. In contrast, latest IGBTs have rather deeper trench structure to obtain lower on-state voltage drop and turn-off loss. In the aspect of the process uniformity and wafer warpage, manufacturing such structure in the CMOS factory is difficult. In this paper, we show the scaling principle toward shallower structure and better performance. The principle is theoretically explained by our previously proposed "Structure Oriented" analytical model. The principle represents a possibility of technology direction and roadmap for future IGBT for improving the device performance consistent with lower cost and high volume productivity with CMOS compatible large diameter wafer technologies.

  4. A CMOS humidity sensor for passive RFID sensing applications.

    PubMed

    Deng, Fangming; He, Yigang; Zhang, Chaolong; Feng, Wei

    2014-05-16

    This paper presents a low-cost low-power CMOS humidity sensor for passive RFID sensing applications. The humidity sensing element is implemented in standard CMOS technology without any further post-processing, which results in low fabrication costs. The interface of this humidity sensor employs a PLL-based architecture transferring sensor signal processing from the voltage domain to the frequency domain. Therefore this architecture allows the use of a fully digital circuit, which can operate on ultra-low supply voltage and thus achieves low-power consumption. The proposed humidity sensor has been fabricated in the TSMC 0.18 μm CMOS process. The measurements show this humidity sensor exhibits excellent linearity and stability within the relative humidity range. The sensor interface circuit consumes only 1.05 µW at 0.5 V supply voltage and reduces it at least by an order of magnitude compared to previous designs.

  5. CMOS reliability issues for emerging cryogenic Lunar electronics applications

    NASA Astrophysics Data System (ADS)

    Chen, Tianbing; Zhu, Chendong; Najafizadeh, Laleh; Jun, Bongim; Ahmed, Adnan; Diestelhorst, Ryan; Espinel, Gustavo; Cressler, John D.

    2006-06-01

    We investigate the reliability issues associated with the application of CMOS devices contained within an advanced SiGe HBT BiCMOS technology to emerging cryogenic space electronics (e.g., down to 43 K, for Lunar missions). Reduced temperature operation improves CMOS device performance (e.g., transconductance, carrier mobility, subthreshold swing, and output current drive), as expected. However, operation at cryogenic temperatures also causes serious device reliability concerns, since it aggravates hot-carrier effects, effectively decreasing the inferred device lifetime significantly, especially at short gate lengths. In the paper, hot-carrier effects are demonstrated to be a stronger function of the device gate length than the temperature, suggesting that significant trade-offs between the gate length and the operational temperature must be made in order to ensure safe and reliable operation over typical projected mission lifetimes in these hostile environments.

  6. Architectures for Low-noise CMOS Electronic Imaging

    NASA Astrophysics Data System (ADS)

    Kawahito, Shoji

    This chapter discusses various types of signal readout architectures for CMOS image sensors, implementing ultra-low-noise conversion of photo-generated charge packets into digital output values. It is based on a detailed analysis of the different noise sources in a CMOS imager, the noise responses of column noise cancelling circuits using correlated double sampling (CDS) and correlated multiple sampling (CMS) techniques and a noiseless signal readout technique using a precise digitizer. Finally, a practical example for the design of a CMOS image sensor with single-photon resolution is presented, and the technological requirements for meeting the condition for room-temperature readout noise of significantly less than 1 electron are discussed.

  7. Operation and biasing for single device equivalent to CMOS

    DOEpatents

    Welch, James D.

    2001-01-01

    Disclosed are semiconductor devices including at least one junction which is rectifying whether the semiconductor is caused to be N or P-type, by the presence of field induced carriers. In particular, inverting and non-inverting gate voltage channel induced semiconductor single devices with operating characteristics similar to conventional multiple device CMOS systems, which can be operated as modulators, are disclosed as are a non-latching SCR and an approach to blocking parasitic currents. Operation of the gate voltage channel induced semiconductor single devices with operating characteristics similar to multiple device CMOS systems under typical bias schemes is described, and simple demonstrative five mask fabrication procedures for the inverting and non-inverting gate voltage channel induced semiconductor single devices with operating characteristics similar to multiple device CMOS systems are also presented.

  8. CMOS biosensors for in vitro diagnosis - transducing mechanisms and applications.

    PubMed

    Lei, Ka-Meng; Mak, Pui-In; Law, Man-Kay; Martins, Rui P

    2016-09-21

    Complementary metal oxide semiconductor (CMOS) technology enables low-cost and large-scale integration of transistors and physical sensing materials on tiny chips (e.g., <1 cm(2)), seamlessly combining the two key functions of biosensors: transducing and signal processing. Recent CMOS biosensors unified different transducing mechanisms (impedance, fluorescence, and nuclear spin) and readout electronics have demonstrated competitive sensitivity for in vitro diagnosis, such as detection of DNA (down to 10 aM), protein (down to 10 fM), or bacteria/cells (single cell). Herein, we detail the recent advances in CMOS biosensors, centering on their key principles, requisites, and applications. Together, these may contribute to the advancement of our healthcare system, which should be decentralized by broadly utilizing point-of-care diagnostic tools.

  9. Complementary Metal-Oxide-Silicon (CMOS)-Memristor Hybrid Nanoelectronics for Advanced Encryption Standard (AES) Encryption

    DTIC Science & Technology

    2016-04-01

    nanodevices may be limited. High- performance CMOS technology will remain as the primary driver for the integrated circuit (IC) industry and non-conventional...memristor hybrid nanoelectronic circuits . Specifically, memristor nanodevices optimized for performance and reliability were developed and integrated with...materials, integrated memristors with CMOS devices, designed and simulated CMOS-memristor hybrid circuits , and performed reliability assessments on

  10. 77 FR 26787 - Certain CMOS Image Sensors and Products Containing Same; Notice of Receipt of Complaint...

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-05-07

    ... COMMISSION Certain CMOS Image Sensors and Products Containing Same; Notice of Receipt of Complaint... complaint entitled Certain CMOS Image Sensors and Products Containing Same, DN 2895; the Commission is... importation of certain CMOS image sensors and products containing same. The complaint names as...

  11. Spectrometer with CMOS demodulation of fiber optic Bragg grating sensors

    NASA Astrophysics Data System (ADS)

    Christiansen, Martin Brokner

    A CMOS imager based spectrometer is developed to interrogate a network containing a large number of Bragg grating sensors. The spectrometer uses a Prism-Grating- Prism (PGP) to spectrally separate serially multiplexed Bragg reflections on a single fiber. As a result, each Bragg grating produces a discrete spot on the CMOS imager that shifts horizontally as the Bragg grating experiences changes in strain or temperature. The reflected wavelength of the spot can be determined by finding the center of the spot produced. The use of a randomly addressable CMOS imager enables a flexible sampling rate. Some fibers can be interrogated at a high sampling rate while others can be interrogated at a low sampling rate. However, the use of a CMOS imager leads to several unique problems in terms of signal processing. These include a logarithmic pixel response, a low signal-to-noise ratio, a long pixel time constant, and software issues. The expected capabilities of the CMOS imager based spectrometer are determined with a theoretical model. The theoretical model tests three algorithms for determining the center of the spot: single row centroid, single row parabolic fit, and entire spot centroid. The theoretical results are compared to laboratory test data and field test data. The CMOS based spectrometer is capable of interrogating many optical fibers, and in the configuration tested, the fiber bundle consisted of 23 fibers. Using this system, a single fiber can be interrogated from 778 nm to 852 nm at 2100 Hz or multiple fibers can be interrogated over the same wavelength so that the total number of fiber interrogations is up to 2100 per second. The reflected Bragg wavelength can be determined within +/-3pm, corresponding to a +/-3μɛ uncertainty.

  12. Specificity of V1-V2 Orientation Networks in the Primate Visual Cortex

    PubMed Central

    Roe, Anna W.; Ts'o, Daniel Y.

    2015-01-01

    The computation of texture and shape involves integration of features of various orientations. Orientation networks within V1 tend to involve cells which share similar orientation selectivity. However, emergent properties in V2 require the integration of multiple orientations. We now show that, unlike interactions within V1, V1-V2 orientation interactions are much less synchronized and are not necessarily orientation dependent. We find V1-V2 orientation networks are of two types: a more tightly synchronized, orientation-preserving network and a less synchronized orientation-diverse network. We suggest that such diversity of V1-V2 interactions underlies the spatial and functional integration required for computation of higher order contour and shape in V2. PMID:26314798

  13. High performance Si nanowire field-effect-transistors based on a CMOS inverter with tunable threshold voltage.

    PubMed

    Van, Ngoc Huynh; Lee, Jae-Hyun; Sohn, Jung Inn; Cha, Seung Nam; Whang, Dongmok; Kim, Jong Min; Kang, Dae Joon

    2014-05-21

    We successfully fabricated nanowire-based complementary metal-oxide semiconductor (NWCMOS) inverter devices by utilizing n- and p-type Si nanowire field-effect-transistors (NWFETs) via a low-temperature fabrication processing technique. We demonstrate that NWCMOS inverter devices can be operated at less than 1 V, a significantly lower voltage than that of typical thin-film based complementary metal-oxide semiconductor (CMOS) inverter devices. This low-voltage operation was accomplished by controlling the threshold voltage of the n-type Si NWFETs through effective management of the nanowire (NW) doping concentration, while realizing high voltage gain (>10) and ultra-low static power dissipation (≤3 pW) for high-performance digital inverter devices. This result offers a viable means of fabricating high-performance, low-operation voltage, and high-density digital logic circuits using a low-temperature fabrication processing technique suitable for next-generation flexible electronics.

  14. Low-voltage, high-extinction-ratio, Mach-Zehnder silicon optical modulator for CMOS-compatible integration.

    PubMed

    Ding, Jianfeng; Chen, Hongtao; Yang, Lin; Zhang, Lei; Ji, Ruiqiang; Tian, Yonghui; Zhu, Weiwei; Lu, Yangyang; Zhou, Ping; Min, Rui

    2012-01-30

    We demonstrate a carrier-depletion Mach-Zehnder silicon optical modulator, which is compatible with CMOS fabrication process and works well at a low driving voltage. This is achieved by the optimization of the coplanar waveguide electrode to reduce the electrical signal transmission loss. At the same time, the velocity and impedance matching are both considered. The 12.5 Gbit/s data transmission experiment of the fabricated device with a 2-mm-long phase shifter is performed. The driving voltages with the swing amplitudes of 1 V and 2 V and the reverse bias voltages of 0.5 V and 0.8 V are applied to the device, respectively. The corresponding extinction ratios are 7.67 and 12.79 dB.

  15. Hoeflea alexandrii sp. nov., isolated from the toxic dinoflagellate Alexandrium minutum AL1V.

    PubMed

    Palacios, Lucía; Arahal, David R; Reguera, Beatriz; Marín, Irma

    2006-08-01

    A Gram-negative, aerobic, non-symbiotic bacterium (AM1V30(T)) was isolated from the toxic dinoflagellate Alexandrium minutum AL1V. On the basis of 16S rRNA gene sequence similarity, strain AM1V30(T) was most closely related (97.4 % similarity) to the type strain of Hoeflea marina, which belongs to the family Phyllobacteriaceae within the order Rhizobiales of the class Alphaproteobacteria. A polyphasic approach was used to clarify the taxonomic position of strain AM1V30(T). During the course of this study, a second species was described by others as belonging to the genus Hoeflea, namely Hoeflea phototrophica; it showed a somewhat higher level of 16S rRNA gene sequence similarity with respect to strain AM1V30(T) (98.2 %) and was also taken into account. The fatty acid profiles, physiological and biochemical data and DNA G+C content (59.7 mol%) support the classification of strain AM1V30(T) as a member of the genus Hoeflea. The characteristics of the novel strain were sufficiently distinct to indicate that it represents a separate species. To confirm this conclusion, DNA-DNA hybridizations were performed: low values (between 15.8 and 29.8 %) were obtained in all cases. Thus, AM1V30(T) represents a novel species within the genus Hoeflea, for which the name Hoeflea alexandrii sp. nov. is proposed. Strain AM1V30(T) (=CECT 5682(T)=DSM 16655(T)) is the type strain.

  16. A Force-Detection NMR Sensor in CMOS-MEMS

    DTIC Science & Technology

    2003-01-01

    Lauterbur. “Design and Analysis of Microcoils for NMR Microscopy.” Journal of Magnetic Resonance B, Vol. 108, pp. 114-124. 1995. 59 [29] Protasis...A Force-Detection NMR Sensor in CMOS-MEMS by Kevin M. Frederick Bachelor of Science, 2001 Carnegie Mellon University, Pittsburgh...REPORT TYPE 3. DATES COVERED 00-00-2003 to 00-00-2003 4. TITLE AND SUBTITLE A Force-Detection NMR Sensor in CMOS-MEMS 5a. CONTRACT NUMBER 5b

  17. Statistical circuit design for yield improvement in CMOS circuits

    NASA Technical Reports Server (NTRS)

    Kamath, H. J.; Purviance, J. E.; Whitaker, S. R.

    1990-01-01

    This paper addresses the statistical design of CMOS integrated circuits for improved parametric yield. The work uses the Monte Carlo technique of circuit simulation to obtain an unbiased estimation of the yield. A simple graphical analysis tool, the yield factor histogram, is presented. The yield factor histograms are generated by a new computer program called SPICENTER. Using the yield factor histograms, the most sensitive circuit parameters are noted, and their nominal values are changed to improve the yield. Two basic CMOS example circuits, one analog and one digital, are chosen and their designs are 'centered' to illustrate the use of the yield factor histograms for statistical circuit design.

  18. CMOS-compatible photonic devices for single-photon generation

    NASA Astrophysics Data System (ADS)

    Xiong, Chunle; Bell, Bryn; Eggleton, Benjamin J.

    2016-09-01

    Sources of single photons are one of the key building blocks for quantum photonic technologies such as quantum secure communication and powerful quantum computing. To bring the proof-of-principle demonstration of these technologies from the laboratory to the real world, complementary metal-oxide-semiconductor (CMOS)-compatible photonic chips are highly desirable for photon generation, manipulation, processing and even detection because of their compactness, scalability, robustness, and the potential for integration with electronics. In this paper, we review the development of photonic devices made from materials (e.g., silicon) and processes that are compatible with CMOS fabrication facilities for the generation of single photons.

  19. Digital architectures for hybrid CMOS/nanodevice circuits

    NASA Astrophysics Data System (ADS)

    Strukov, Dmitri B.

    This dissertation describes architectures of digital memories and reconfigurable Boolean logic circuits for the prospective hybrid CMOS/nanowire/nanodevice ("CMOL") technology. The basic idea of CMOL circuits is to combine the advantages of CMOS technology (including its flexibility and high fabrication yield) with those of molecular-scale nanodevices. Two-terminal nanodevices would be naturally incorporated into nanowire crossbar fabric, enabling very high function density at acceptable fabrication costs. In order to overcome the CMOS/nanodevice interface problem, in CMOL circuits the interface is provided by sharp-tipped pins that are distributed all over the circuit area, on top of the CMOS stack. The most straightforward possible application of CMOL circuits is terabit-scale "resistive" memories, in which nanodevices (e.g., single molecules) would be used as single-bit, memory cells, while the semiconductor subsystem would perform all the peripheral (input/output, coding/decoding, line driving, and sense amplification) functions. Using bad-bit exclusion and error-correcting codes synergistically we show that CMOL memories with a nano/CMOS pitch ratio close to 1/3 may overcome purely semiconductor memories in useful density if the fraction of bad nanodevices is below ˜ 15%, even for the 30 ns upper bound on the total access time. As the nanotechnology matures, and the pitch ratio approaches an order of magnitude, the CMOL memories may be far superior to the densest semiconductor memories by providing, e.g., 1 Tbit/cm2 density even for the plausible defect fraction of 2%. Even greater defect tolerance (about 20% for 99% circuit yield) can be achieved in uniform a cell-FPGA-like CMOL circuits. In such circuits, two-terminal nanodevices provide programmable diode functionality for logic circuit operation, and allow circuit mapping and reconfiguration around defective nanodevices, while CMOS subsystem is used for signal restoration and latching. The cell

  20. Large Format CMOS-based Detectors for Diffraction Studies

    NASA Astrophysics Data System (ADS)

    Thompson, A. C.; Nix, J. C.; Achterkirchen, T. G.; Westbrook, E. M.

    2013-03-01

    Complementary Metal Oxide Semiconductor (CMOS) devices are rapidly replacing CCD devices in many commercial and medical applications. Recent developments in CMOS fabrication have improved their radiation hardness, device linearity, readout noise and thermal noise, making them suitable for x-ray crystallography detectors. Large-format (e.g. 10 cm × 15 cm) CMOS devices with a pixel size of 100 μm × 100 μm are now becoming available that can be butted together on three sides so that very large area detector can be made with no dead regions. Like CCD systems our CMOS systems use a GdOS:Tb scintillator plate to convert stopping x-rays into visible light which is then transferred with a fiber-optic plate to the sensitive surface of the CMOS sensor. The amount of light per x-ray on the sensor is much higher in the CMOS system than a CCD system because the fiber optic plate is only 3 mm thick while on a CCD system it is highly tapered and much longer. A CMOS sensor is an active pixel matrix such that every pixel is controlled and readout independently of all other pixels. This allows these devices to be readout while the sensor is collecting charge in all the other pixels. For x-ray diffraction detectors this is a major advantage since image frames can be collected continuously at up 20 Hz while the crystal is rotated. A complete diffraction dataset can be collected over five times faster than with CCD systems with lower radiation exposure to the crystal. In addition, since the data is taken fine-phi slice mode the 3D angular position of diffraction peaks is improved. We have developed a cooled 6 sensor CMOS detector with an active area of 28.2 × 29.5 cm with 100 μm × 100 μm pixels and a readout rate of 20 Hz. The detective quantum efficiency exceeds 60% over the range 8-12 keV. One, two and twelve sensor systems are also being developed for a variety of scientific applications. Since the sensors are butt able on three sides, even larger systems could be built at

  1. Statistical circuit design for yield improvement in CMOS circuits

    NASA Technical Reports Server (NTRS)

    Kamath, H. J.; Purviance, J. E.; Whitaker, S. R.

    1990-01-01

    This paper addresses the statistical design of CMOS integrated circuits for improved parametric yield. The work uses the Monte Carlo technique of circuit simulation to obtain an unbiased estimation of the yield. A simple graphical analysis tool, the yield factor histogram, is presented. The yield factor histograms are generated by a new computer program called SPICENTER. Using the yield factor histograms, the most sensitive circuit parameters are noted, and their nominal values are changed to improve the yield. Two basic CMOS example circuits, one analog and one digital, are chosen and their designs are 'centered' to illustrate the use of the yield factor histograms for statistical circuit design.

  2. Black silicon enhanced photodetectors: a path to IR CMOS

    NASA Astrophysics Data System (ADS)

    Pralle, M. U.; Carey, J. E.; Homayoon, H.; Alie, S.; Sickler, J.; Li, X.; Jiang, J.; Miller, D.; Palsule, C.; McKee, J.

    2010-04-01

    SiOnyx has developed a novel silicon processing technology for CMOS sensors that will extend spectral sensitivity into the near/shortwave infrared (NIR/SWIR) and enable a full performance digital night vision capability comparable to that of current image-intensifier based night vision goggles. The process is compatible with established CMOS manufacturing infrastructure and has the promise of much lower cost than competing approaches. The measured thin layer quantum efficiency is as much as 10x that of incumbent imaging sensors with spectral sensitivity from 400 to 1200 nm.

  3. IR CMOS: ultrafast laser-enhanced silicon detection

    NASA Astrophysics Data System (ADS)

    Pralle, M. U.; Carey, J. E.; Homayoon, H.; Sickler, J.; Li, X.; Jiang, J.; Miller, D.; Palsule, C.; McKee, J.

    2011-06-01

    SiOnyx has developed a novel silicon processing technology for CMOS sensors that will extend spectral sensitivity into the near/shortwave infrared (NIR/SWIR) and enable a full performance digital night vision capability comparable to that of current image-intensifier based night vision goggles. The process is compatible with established CMOS manufacturing infrastructure and has the promise of much lower cost than competing approaches. The measured thin layer quantum efficiency is as much as 10x that of incumbent imaging sensors with spectral sensitivity from 400 to 1200 nm.

  4. Modifications in CMOS Dynamic Logic Style: A Review Paper

    NASA Astrophysics Data System (ADS)

    Meher, Preetisudha; Mahapatra, Kamalakanta

    2015-12-01

    Dynamic logic style is used in high performance circuit design because of its fast speed and less transistors requirement as compared to CMOS logic style. But it is not widely accepted for all types of circuit implementations due to its less noise tolerance and charge sharing problems. A small noise at the input of the dynamic logic can change the desired output. Domino logic uses one static CMOS inverter at the output of dynamic node which is more noise immune and consuming very less power as compared to other proposed circuit. In this paper, an overview and classification of these techniques are first presented and then compared according to their performance.

  5. A 128 x 128 CMOS Active Pixel Image Sensor for Highly Integrated Imaging Systems

    NASA Technical Reports Server (NTRS)

    Mendis, Sunetra K.; Kemeny, Sabrina E.; Fossum, Eric R.

    1993-01-01

    A new CMOS-based image sensor that is intrinsically compatible with on-chip CMOS circuitry is reported. The new CMOS active pixel image sensor achieves low noise, high sensitivity, X-Y addressability, and has simple timing requirements. The image sensor was fabricated using a 2 micrometer p-well CMOS process, and consists of a 128 x 128 array of 40 micrometer x 40 micrometer pixels. The CMOS image sensor technology enables highly integrated smart image sensors, and makes the design, incorporation and fabrication of such sensors widely accessible to the integrated circuit community.

  6. Design and integration of a high accuracy multichannel analog CMOS peak detect and hold circuit for APD-based PET imaging.

    PubMed

    Fang, Xiaochao; Brasse, David; Hu-Guo, Christine; Hu, Yann

    2012-04-01

    This paper presents the design of a high accuracy multichannel peak detect and hold (PDH) circuit. This PDH measures the energy of an event and is one part of a readout chain for avalanche photo diodes (APD)-based positron emission tomography (PET) imaging. The circuit is designed in a 0.35μm CMOS process. The proposed PDH is dedicated to ultra low amplitude, large amplitude range from several tens millivolts to 1.1 V, and fast peaking time (190 ns) semi-Gaussian pulses. The two-phase technique has been used to cancel the major error source of the classical CMOS PDH: offset. A two-gain OTA is applied to minimize the DC error. A peak error less 1% for a small input signal (amplitude is between 40 mV and 300 mV) and a peak error less than 0.2% for a large input signal (amplitude is between 300 mV and 1.1 V) have been obtained from test. The area of a PDH is equal to about 200 μm × 40 μm. In our PDH system, the drop rate is negligible.

  7. Flexible CMOS-Like Circuits Based on Printed P-Type and N-Type Carbon Nanotube Thin-Film Transistors.

    PubMed

    Zhang, Xiang; Zhao, Jianwen; Dou, Junyan; Tange, Masayoshi; Xu, Weiwei; Mo, Lixin; Xie, Jianjun; Xu, Wenya; Ma, Changqi; Okazaki, Toshiya; Cui, Zheng

    2016-09-01

    P-type and n-type top-gate carbon nanotube thin-film transistors (TFTs) can be selectively and simultaneously fabricated on the same polyethylene terephthalate (PET) substrate by tuning the types of polymer-sorted semiconducting single-walled carbon nanotube (sc-SWCNT) inks, along with low temperature growth of HfO2 thin films as shared dielectric layers. Both the p-type and n-type TFTs show good electrical properties with on/off ratio of ≈10(5) , mobility of ≈15 cm(2) V(-1) s(-1) , and small hysteresis. Complementary metal oxide semiconductor (CMOS)-like logic gates and circuits based on as-prepared p-type and n-type TFTs have been achieved. Flexible CMOS-like inverters exhibit large noise margin of 84% at low voltage (1/2 Vdd = 1.5 V) and maximum voltage gain of 30 at Vdd of 1.5 V and low power consumption of 0.1 μW. Both of the noise margin and voltage gain are one of the best values reported for flexible CMOS-like inverters at Vdd less than 2 V. The printed CMOS-like inverters work well at 10 kHz with 2% voltage loss and delay time of ≈15 μs. A 3-stage ring oscillator has also been demonstrated on PET substrates and the oscillation frequency of 3.3 kHz at Vdd of 1 V is achieved.

  8. Developments and Applications of High-Performance CCD and CMOS Imaging Arrays

    NASA Astrophysics Data System (ADS)

    Janesick, James; Putnam, Gloria

    2003-12-01

    For over 20 years, charge-coupled devices (CCDs) have dominated most digital imaging applications and markets. Today, complementary metal oxide semiconductor (CMOS) arrays are displacing CCDs in some applications, and this trend is expected to continue. Low cost, low power, on-chip system integration, and high-speed operation are unique features that have generated interest in CMOS arrays. This paper reviews current CCD and CMOS sensor developments and related applications. We compare fundamental performance parameters common to these technologies and describe why the CCD is considered a mature technology, whereas CMOS arrays have significant room for growth. The paper presents custom CMOS pixel designs and related fabrication processes that address performance deficiencies of the CCD in high-performance applications. We discuss areas of development for future CCD and CMOS imagers. The paper also briefly reviews hybrid imaging arrays that combine the advantages of CCD and CMOS, producing better sensors than either technology alone can provide.

  9. CMOS VLSI Layout and Verification of a SIMD Computer

    NASA Technical Reports Server (NTRS)

    Zheng, Jianqing

    1996-01-01

    A CMOS VLSI layout and verification of a 3 x 3 processor parallel computer has been completed. The layout was done using the MAGIC tool and the verification using HSPICE. Suggestions for expanding the computer into a million processor network are presented. Many problems that might be encountered when implementing a massively parallel computer are discussed.

  10. Reliability design of CMOS image sensor for space applications

    NASA Astrophysics Data System (ADS)

    Xie, Ning; Chen, Shijun; Chen, Yongping

    2013-08-01

    In space applications, sensors work in very harsh space environment. Thus the reliability design must be carefully considered. This paper addresses the techniques which effectively increase the reliability of CMOS image sensors. A radiation tolerant pixel design which is implemented in a sun tracker sensor is presented. Measurement results of total dose radiation, SEL, SEU, etc prove the radiation immunity of the sensor.

  11. Quantification of Shallow-junction Dopant Loss during CMOS Process

    SciTech Connect

    Buh, G.H.; Park, T.; Jee, Y.; Hong, S.J.; Ryoo, C.; Yoo, J.; Lee, J.W.; Yon, G.H.; Jun, C.S.; Shin, Y.G.; Chung, U.-In; Moon, J.T.

    2005-09-09

    We analyzed dopant concentration and profiles in source drain extension (SDE) by using in-line low energy electron induced x-ray emission spectrometry (LEXES), four point probe (FPP), and secondary ion mass spectroscopy (SIMS). By monitoring the dopant dose with LEXES, dopant loss in implantation and annealing process was successfully quantified. To measure the actual SDE sheet resistance in CMOS device structure without probe penetration in FPP, we fabricated a simple SDE sheet-resistance test structure (SSTS) by modifying a conventional CMOS process. It was found that the sheet resistances determined with SSTS are larger than those measured with FPP. There are three mechanisms of dopants loss in CMOS process: 1) wet-etching removal during photo resist cleaning, 2) out-diffusion, and 3) deactivation by post-thermal process. We quantified the loss of the dopant in SDE during the CMOS process, and found that the wet-etching removal and out-diffusion are the most significant causes for dopant loss in n-SDE and p-SDE, respectively.

  12. Fundamental Problems of Hybrid CMOS/Nanodevice Circuits

    DTIC Science & Technology

    2010-12-14

    allowing individual access to each via from the peripheral contact pads . Such layout is sufficient for a broad range of experiments with CMOS...mechanical polishing ( CMP ). For that, we have modified a commercial, 2- inch CMP tool for individual chip processing. Inspection and testing of the polished

  13. Planar CMOS analog SiPMs: design, modeling, and characterization

    NASA Astrophysics Data System (ADS)

    Zou, Yu; Villa, Federica; Bronzi, Danilo; Tisa, Simone; Tosi, Alberto; Zappa, Franco

    2015-11-01

    Silicon photomultipliers (SiPMs) are large area detectors consisting of an array of single-photon-sensitive microcells, which make SiPMs extremely attractive to substitute the photomultiplier tubes in many applications. We present the design, fabrication, and characterization of analog SiPMs in standard planar 0.35 μm CMOS technology, with about 1 mm × 1 mm total area and different kinds of microcells, based on single-photon avalanche diodes with 30 μm diameter reaching 21.0% fill-factor (FF), 50 μm diameter (FF = 58.3%) or 50 μm square active area with rounded corner of 5 μm radius (FF = 73.7%). We also developed the electrical SPICE model for CMOS SiPMs. Our CMOS SiPMs have 25 V breakdown voltage, in line with most commercial SiPMs and higher gain (8.8 × 106, 13.2 × 106, and 15.0 × 106, respectively). Although dark count rate density is slightly higher than state-of-the-art analog SiPMs, the proposed standard CMOS processing opens the feasibility of integration with active electronics, for switching hot pixels off, drastically reducing the overall dark count rate, or for further on-chip processing.

  14. High speed CMOS/SOS standard cell notebook

    NASA Technical Reports Server (NTRS)

    1978-01-01

    The NASA/MSFC high speed CMOS/SOS standard cell family, designed to be compatible with the PR2D (Place, Route in 2-Dimensions) automatic layout program, is described. Standard cell data sheets show the logic diagram, the schematic, the truth table, and propagation delays for each logic cell.

  15. Cargo Movement Operations System (CMOS) Draft Version Description Document

    DTIC Science & Technology

    1990-12-13

    00 TECHNICAL REPORT (For The N Cargo Movement Operations System (CMOS) Draft Version Description Document D TIC I SELECTED I 13 December 199U...INTRODUCTION. The purpose of this Technical Report is to review the Draft Version Desription Document, CDRL A015-02, which was produced for the

  16. Fabrication and Characterization of CMOS-MEMS Thermoelectric Micro Generators

    PubMed Central

    Kao, Pin-Hsu; Shih, Po-Jen; Dai, Ching-Liang; Liu, Mao-Chen

    2010-01-01

    This work presents a thermoelectric micro generator fabricated by the commercial 0.35 μm complementary metal oxide semiconductor (CMOS) process and the post-CMOS process. The micro generator is composed of 24 thermocouples in series. Each thermocouple is constructed by p-type and n-type polysilicon strips. The output power of the generator depends on the temperature difference between the hot and cold parts in the thermocouples. In order to prevent heat-receiving in the cold part in the thermocouples, the cold part is covered with a silicon dioxide layer with low thermal conductivity to insulate the heat source. The hot part of the thermocouples is suspended and connected to an aluminum plate, to increases the heat-receiving area in the hot part. The generator requires a post-CMOS process to release the suspended structures. The post-CMOS process uses an anisotropic dry etching to remove the oxide sacrificial layer and an isotropic dry etching to etch the silicon substrate. Experimental results show that the micro generator has an output voltage of 67 μV at the temperature difference of 1 K. PMID:22205869

  17. Integrated imaging sensor systems with CMOS active pixel sensor technology

    NASA Technical Reports Server (NTRS)

    Yang, G.; Cunningham, T.; Ortiz, M.; Heynssens, J.; Sun, C.; Hancock, B.; Seshadri, S.; Wrigley, C.; McCarty, K.; Pain, B.

    2002-01-01

    This paper discusses common approaches to CMOS APS technology, as well as specific results on the five-wire programmable digital camera-on-a-chip developed at JPL. The paper also reports recent research in the design, operation, and performance of APS imagers for several imager applications.

  18. CMOS Active-Pixel Image Sensor With Simple Floating Gates

    NASA Technical Reports Server (NTRS)

    Fossum, Eric R.; Nakamura, Junichi; Kemeny, Sabrina E.

    1996-01-01

    Experimental complementary metal-oxide/semiconductor (CMOS) active-pixel image sensor integrated circuit features simple floating-gate structure, with metal-oxide/semiconductor field-effect transistor (MOSFET) as active circuit element in each pixel. Provides flexibility of readout modes, no kTC noise, and relatively simple structure suitable for high-density arrays. Features desirable for "smart sensor" applications.

  19. Novel Ferroelectric CMOS Circuits as a Nonvolatile Logic

    NASA Astrophysics Data System (ADS)

    Takahashi, M.; Horiuchi, T.; Li, Q.-H.; Wang, S.; Yun, K. Y.; Sakai, S.

    2008-03-01

    We propose a novel and promising nonvolatile-logic circuit constructed by p channel type (Pch) and n channel type (Nch) ferroelectric gate field effect transistors (FeFETs), which we named a ferroelectric CMOS (FeCMOS) circuit. The circuit works as both logic and memory. We fabricated a NOT logic FeCMOS device which have Pt metal gates and gate oxides of ferroelectric SrBi2Ta2O9 (SBT) and high-k HfAlO on Si. Key technology was adjusting threshold voltages of the FeFETs as well as preparing those of high quality. We demonstrate basic operations of the NOT-logic response, memory writing, holding and non-destructive reading. The memory writing is done by amplifying the input node voltage to a higher level when the node was logically high and to a lower one when it was logically low just before the writing operation. The data retention was also measured. The retained high and low voltages were almost unchanged for 1.2 days. The idea of this FeCMOS will enhance flexibility of circuit designing by merging logic and memory functions. This work was partially supported by NEDO.

  20. Effects Of Dose Rates On Radiation Damage In CMOS Parts

    NASA Technical Reports Server (NTRS)

    Goben, Charles A.; Coss, James R.; Price, William E.

    1990-01-01

    Report describes measurements of effects of ionizing-radiation dose rate on consequent damage to complementary metal oxide/semiconductor (CMOS) electronic devices. Depending on irradiation time and degree of annealing, survivability of devices in outer space, or after explosion of nuclear weapons, enhanced. Annealing involving recovery beyond pre-irradiation conditions (rebound) detrimental. Damage more severe at lower dose rates.

  1. Neutron induced soft errors in CMOS memories under reduced bias

    SciTech Connect

    Hazucha, P.; Svensson, C.; Johansson, K. |

    1998-12-01

    A custom designed 16 kbit CMOS memory was irradiated by 14 MeV neutrons and 100 MeV neutrons. SEU cross sections were evaluated under different supply voltages. The cross section values are compared to those predicted by the BGR model.

  2. Simulation toolkit with CMOS detector in the framework of hadrontherapy

    NASA Astrophysics Data System (ADS)

    Rescigno, R.; Finck, Ch.; Juliani, D.; Baudot, J.; Dauvergne, D.; Dedes, G.; Krimmer, J.; Ray, C.; Reithinger, V.; Rousseau, M.; Testa, E.; Winter, M.

    2014-03-01

    Proton imaging can be seen as a powerful technique for on-line monitoring of ion range during carbon ion therapy irradiation. The protons detection technique uses, as three-dimensional tracking system, a set of CMOS sensor planes. A simulation toolkit based on GEANT4 and ROOT is presented including detector response and reconstruction algorithm.

  3. CMOS Bit-Stream Band-Pass Beamforming

    DTIC Science & Technology

    2016-03-31

    CMOS Bit-Stream Band-Pass Beamforming1 Michael P. Flynn and Jaehun Jeong Electrical Engineering and Computer Science University of Michigan Ann...M. P. Flynn , “An IF 8- Element 2-Beam Bit-Stream Band-Pass Beamformer," IEEE Radio Frequency Integrated Circuits Symposium (RFIC), June 2015. 2. M

  4. INDEP approach for leakage reduction in nanoscale CMOS circuits

    NASA Astrophysics Data System (ADS)

    Sharma, Vijay Kumar; Pattanaik, Manisha; Raj, Balwinder

    2015-02-01

    Complementary metal oxide semiconductor (CMOS) technology scaling for improving speed and functionality turns leakage power one of the major concerns for nanoscale circuits design. The minimization of leakage power is a rising challenge for the design of the existing and future nanoscale CMOS circuits. This paper presents a novel, input-dependent, transistor-level, low leakage and reliable INput DEPendent (INDEP) approach for nanoscale CMOS circuits. INDEP approach is based on Boolean logic calculations for the input signals of the extra inserted transistors within the logic circuit. The gate terminals of extra inserted transistors depend on the primary input combinations of the logic circuits. The appropriate selection of input gate voltages of INDEP transistors are reducing the leakage current efficiently along with rail to rail output voltage swing. The important characteristic of INDEP approach is that it works well in both active as well as standby modes of the circuits. This approach overcomes the limitations created by the prevalent current leakage reduction techniques. The simulation results indicate that INDEP approach mitigates 41.6% and 35% leakage power for 1-bit full adder and ISCAS-85 c17 benchmark circuit, respectively, at 32 nm bulk CMOS technology node.

  5. Fabrication and characterization of CMOS-MEMS thermoelectric micro generators.

    PubMed

    Kao, Pin-Hsu; Shih, Po-Jen; Dai, Ching-Liang; Liu, Mao-Chen

    2010-01-01

    This work presents a thermoelectric micro generator fabricated by the commercial 0.35 μm complementary metal oxide semiconductor (CMOS) process and the post-CMOS process. The micro generator is composed of 24 thermocouples in series. Each thermocouple is constructed by p-type and n-type polysilicon strips. The output power of the generator depends on the temperature difference between the hot and cold parts in the thermocouples. In order to prevent heat-receiving in the cold part in the thermocouples, the cold part is covered with a silicon dioxide layer with low thermal conductivity to insulate the heat source. The hot part of the thermocouples is suspended and connected to an aluminum plate, to increases the heat-receiving area in the hot part. The generator requires a post-CMOS process to release the suspended structures. The post-CMOS process uses an anisotropic dry etching to remove the oxide sacrificial layer and an isotropic dry etching to etch the silicon substrate. Experimental results show that the micro generator has an output voltage of 67 μV at the temperature difference of 1 K.

  6. Single Event Upset Behavior of CMOS Static RAM Cells

    NASA Technical Reports Server (NTRS)

    Lieneweg, Udo; Jeppson, Kjell O.; Buehler, Martin G.

    1993-01-01

    An improved state-space analysis of the CMOS static RAM cell is presented. Introducing theconcept of the dividing line, the critical charge for heavy-ion-induced upset of memory cells can becalculated considering symmetrical as well as asymmetrical capacitive loads. From the criticalcharge, the upset-rate per bit-day for static RAMs can be estimated.

  7. Thin Film on CMOS Active Pixel Sensor for Space Applications.

    PubMed

    Schulze Spuentrup, Jan Dirk; Burghartz, Joachim N; Graf, Heinz-Gerd; Harendt, Christine; Hutter, Franz; Nicke, Markus; Schmidt, Uwe; Schubert, Markus; Sterzel, Juergen

    2008-10-13

    A 664 x 664 element Active Pixel image Sensor (APS) with integrated analog signal processing, full frame synchronous shutter and random access for applications in star sensors is presented and discussed. A thick vertical diode array in Thin Film on CMOS (TFC) technology is explored to achieve radiation hardness and maximum fill factor.

  8. CMOS Active-Pixel Image Sensor With Simple Floating Gates

    NASA Technical Reports Server (NTRS)

    Fossum, Eric R.; Nakamura, Junichi; Kemeny, Sabrina E.

    1996-01-01

    Experimental complementary metal-oxide/semiconductor (CMOS) active-pixel image sensor integrated circuit features simple floating-gate structure, with metal-oxide/semiconductor field-effect transistor (MOSFET) as active circuit element in each pixel. Provides flexibility of readout modes, no kTC noise, and relatively simple structure suitable for high-density arrays. Features desirable for "smart sensor" applications.

  9. Research-grade CMOS image sensors for demanding space applications

    NASA Astrophysics Data System (ADS)

    Saint-Pé, Olivier; Tulet, Michel; Davancens, Robert; Larnaudie, Franck; Magnan, Pierre; Corbière, Franck; Martin-Gonthier, Philippe; Belliot, Pierre

    2004-06-01

    Imaging detectors are key elements for optical instruments and sensors on board space missions dedicated to Earth observation (high resolution imaging, atmosphere spectroscopy...), Solar System exploration (micro cameras, guidance for autonomous vehicle...) and Universe observation (space telescope focal planes, guiding sensors...). This market has been dominated by CCD technology for long. Since the mid-90s, CMOS Image Sensors (CIS) have been competing with CCDs for more and more consumer domains (webcams, cell phones, digital cameras...). Featuring significant advantages over CCD sensors for space applications (lower power consumption, smaller system size, better radiations behaviour...), CMOS technology is also expanding in this field, justifying specific R&D and development programs funded by national and European space agencies (mainly CNES, DGA, and ESA). All along the 90s and thanks to their increasingly improving performances, CIS have started to be successfully used for more and more demanding applications, from vision and control functions requiring low-level performances to guidance applications requiring medium-level performances. Recent technology improvements have made possible the manufacturing of research-grade CIS that are able to compete with CCDs in the high-performances arena. After an introduction outlining the growing interest of optical instruments designers for CMOS image sensors, this talk will present the existing and foreseen ways to reach high-level electro-optics performances for CIS. The developments of CIS prototypes built using an imaging CMOS process and of devices based on improved designs will be presented.

  10. Research-grade CMOS image sensors for remote sensing applications

    NASA Astrophysics Data System (ADS)

    Saint-Pe, Olivier; Tulet, Michel; Davancens, Robert; Larnaudie, Franck; Magnan, Pierre; Martin-Gonthier, Philippe; Corbiere, Franck; Belliot, Pierre; Estribeau, Magali

    2004-11-01

    Imaging detectors are key elements for optical instruments and sensors on board space missions dedicated to Earth observation (high resolution imaging, atmosphere spectroscopy...), Solar System exploration (micro cameras, guidance for autonomous vehicle...) and Universe observation (space telescope focal planes, guiding sensors...). This market has been dominated by CCD technology for long. Since the mid-90s, CMOS Image Sensors (CIS) have been competing with CCDs for consumer domains (webcams, cell phones, digital cameras...). Featuring significant advantages over CCD sensors for space applications (lower power consumption, smaller system size, better radiations behaviour...), CMOS technology is also expanding in this field, justifying specific R&D and development programs funded by national and European space agencies (mainly CNES, DGA and ESA). All along the 90s and thanks to their increasingly improving performances, CIS have started to be successfully used for more and more demanding space applications, from vision and control functions requiring low-level performances to guidance applications requiring medium-level performances. Recent technology improvements have made possible the manufacturing of research-grade CIS that are able to compete with CCDs in the high-performances arena. After an introduction outlining the growing interest of optical instruments designers for CMOS image sensors, this paper will present the existing and foreseen ways to reach high-level electro-optics performances for CIS. The developments and performances of CIS prototypes built using an imaging CMOS process will be presented in the corresponding section.

  11. Analysis of pixel circuits in CMOS image sensors

    NASA Astrophysics Data System (ADS)

    Mei, Zou; Chen, Nan; Yao, Li-bin

    2015-04-01

    CMOS image sensors (CIS) have lower power consumption, lower cost and smaller size than CCD image sensors. However, generally CCDs have higher performance than CIS mainly due to lower noise. The pixel circuit used in CIS is the first part of the signal processing circuit and connected to photodiode directly, so its performance will greatly affect the CIS or even the whole imaging system. To achieve high performance, CMOS image sensors need advanced pixel circuits. There are many pixel circuits used in CIS, such as passive pixel sensor (PPS), 3T and 4T active pixel sensor (APS), capacitive transimpedance amplifier (CTIA), and passive pixel sensor (PPS). At first, the main performance parameters of each pixel structure including the noise, injection efficiency, sensitivity, power consumption, and stability of bias voltage are analyzed. Through the theoretical analysis of those pixel circuits, it is concluded that CTIA pixel circuit has good noise performance, high injection efficiency, stable photodiode bias, and high sensitivity with small integrator capacitor. Furthermore, the APS and CTIA pixel circuits are simulated in a standard 0.18-μm CMOS process and using a n-well/p-sub photodiode by SPICE and the simulation result confirms the theoretical analysis result. It shows the possibility that CMOS image sensors can be extended to a wide range of applications requiring high performance.

  12. CMOS Ultra Low Power Radiation Tolerant (CULPRiT) Microelectronics

    NASA Technical Reports Server (NTRS)

    Yeh, Penshu; Maki, Gary

    2007-01-01

    Space Electronics needs Radiation Tolerance or hardness to withstand the harsh space environment: high-energy particles can change the state of the electronics or puncture transistors making them disfunctional. This viewgraph document reviews the use of CMOS Ultra Low Power Radiation Tolerant circuits for NASA's electronic requirements.

  13. Mechanically Flexible and High-Performance CMOS Logic Circuits.

    PubMed

    Honda, Wataru; Arie, Takayuki; Akita, Seiji; Takei, Kuniharu

    2015-10-13

    Low-power flexible logic circuits are key components required by the next generation of flexible electronic devices. For stable device operation, such components require a high degree of mechanical flexibility and reliability. Here, the mechanical properties of low-power flexible complementary metal-oxide-semiconductor (CMOS) logic circuits including inverter, NAND, and NOR are investigated. To fabricate CMOS circuits on flexible polyimide substrates, carbon nanotube (CNT) network films are used for p-type transistors, whereas amorphous InGaZnO films are used for the n-type transistors. The power consumption and voltage gain of CMOS inverters are <500 pW/mm at Vin = 0 V (<7.5 nW/mm at Vin = 5 V) and >45, respectively. Importantly, bending of the substrate is not found to cause significant changes in the device characteristics. This is also observed to be the case for more complex flexible NAND and NOR logic circuits for bending states with a curvature radius of 2.6 mm. The mechanical stability of these CMOS logic circuits makes them ideal candidates for use in flexible integrated devices.

  14. CMOS image sensors as an efficient platform for glucose monitoring.

    PubMed

    Devadhasan, Jasmine Pramila; Kim, Sanghyo; Choi, Cheol Soo

    2013-10-07

    Complementary metal oxide semiconductor (CMOS) image sensors have been used previously in the analysis of biological samples. In the present study, a CMOS image sensor was used to monitor the concentration of oxidized mouse plasma glucose (86-322 mg dL(-1)) based on photon count variation. Measurement of the concentration of oxidized glucose was dependent on changes in color intensity; color intensity increased with increasing glucose concentration. The high color density of glucose highly prevented photons from passing through the polydimethylsiloxane (PDMS) chip, which suggests that the photon count was altered by color intensity. Photons were detected by a photodiode in the CMOS image sensor and converted to digital numbers by an analog to digital converter (ADC). Additionally, UV-spectral analysis and time-dependent photon analysis proved the efficiency of the detection system. This simple, effective, and consistent method for glucose measurement shows that CMOS image sensors are efficient devices for monitoring glucose in point-of-care applications.

  15. Detection and compensation of bad pixel for CMOS image sensor

    NASA Astrophysics Data System (ADS)

    Xu, Youqing; Yu, Shengsheng; Zhou, Jingli; Fang, Zuyuan

    2000-05-01

    This paper presents a detailed analysis of the occurring reason and features of bad pixels in CMOS image sensor. Detect and compensate algorithms have also bee introduced. Experimental result show that the algorithms are efficiently when they are applied on CH5001 produced by Chrontel Inc.

  16. Hybrid CMOS SiPIN detectors as astronomical imagers

    NASA Astrophysics Data System (ADS)

    Simms, Lance Michael

    Charge Coupled Devices (CCDs) have dominated optical and x-ray astronomy since their inception in 1969. Only recently, through improvements in design and fabrication methods, have imagers that use Complimentary Metal Oxide Semiconductor (CMOS) technology gained ground on CCDs in scientific imaging. We are now in the midst of an era where astronomers might begin to design optical telescope cameras that employ CMOS imagers. The first three chapters of this dissertation are primarily composed of introductory material. In them, we discuss the potential advantages that CMOS imagers offer over CCDs in astronomical applications. We compare the two technologies in terms of the standard metrics used to evaluate and compare scientific imagers: dark current, read noise, linearity, etc. We also discuss novel features of CMOS devices and the benefits they offer to astronomy. In particular, we focus on a specific kind of hybrid CMOS sensor that uses Silicon PIN photodiodes to detect optical light in order to overcome deficiencies of commercial CMOS sensors. The remaining four chapters focus on a specific type of hybrid CMOS Silicon PIN sensor: the Teledyne Hybrid Visible Silicon PIN Imager (HyViSI). In chapters four and five, results from testing HyViSI detectors in the laboratory and at the Kitt Peak 2.1m telescope are presented. We present our laboratory measurements of the standard detector metrics for a number of HyViSI devices, ranging from 1k×1k to 4k×4k format. We also include a description of the SIDECAR readout circuit that was used to control the detectors. We then show how they performed at the telescope in terms of photometry, astrometry, variability measurement, and telescope focusing and guiding. Lastly, in the final two chapters we present results on detector artifacts such as pixel crosstalk, electronic crosstalk, and image persistence. One form of pixel crosstalk that has not been discussed elsewhere in the literature, which we refer to as Interpixel Charge

  17. Characterizations of and Radiation Effects in Several Emerging CMOS Technologies

    NASA Astrophysics Data System (ADS)

    Shufeng Ren

    As the conventional scaling of Si based CMOS is approaching its limit at 7 nm technology node, many perceive that the adoption of novel materials and/or device structures are inevitable to keep Moore's law going. High mobility channel materials such as III-V compound semiconductors or Ge are considered promising to replace Si in order to achieve high performance as well as low power consumption. However, interface and oxide traps have become a major obstacle for high-mobility semiconductors (such as Ge, GaAs, InGaAs, GaSb, etc) to replace Si CMOS technology. Therefore novel high-k dielectrics, such as epitaxially grown crystalline oxides, have been explored to be incorporated onto the high mobility channel materials. Moreover, to enable continued scaling, extremely scaled devices structures such as nanowire gate-all-around structure are needed in the near future. Moreover, as the CMOS industry moves into the 7 nm node and beyond, novel lithography techniques such as EUV are believed to be adopted soon, which can bring radiation damage to CMOS devices and circuit during the fabrication process. Therefore radiation hardening technology in future generations of CMOS devices has again become an interesting research topic to deal with the possible process-induced damage as well as damage caused by operating in radiation harsh environment such as outer space, nuclear plant, etc. In this thesis, the electrical properties of a few selected emerging novel CMOS devices are investigated, which include InGaAs based extremely scaled ultra-thin body nanowire gate-all-around MOSFETs, GOI (Ge On Insulator) CMOS with recessed channel and source/drain, GaAs MOSFETs with crystalline La based gate stack, and crystalline SrTiO3, are investigated to extend our understanding of their electrical characteristics, underlying physical mechanisms, and material properties. Furthermore, the radiation responses of these aforementioned novel devices are thoroughly investigated, with a focus on

  18. A Monolithic CMOS Magnetic Hall Sensor with High Sensitivity and Linearity Characteristics

    PubMed Central

    Huang, Haiyun; Wang, Dejun; Xu, Yue

    2015-01-01

    This paper presents a fully integrated linear Hall sensor by means of 0.8 μm high voltage complementary metal-oxide semiconductor (CMOS) technology. This monolithic Hall sensor chip features a highly sensitive horizontal switched Hall plate and an efficient signal conditioner using dynamic offset cancellation technique. An improved cross-like Hall plate achieves high magnetic sensitivity and low offset. A new spinning current modulator stabilizes the quiescent output voltage and improves the reliability of the signal conditioner. The tested results show that at the 5 V supply voltage, the maximum Hall output voltage of the monolithic Hall sensor microsystem, is up to ±2.1 V and the linearity of Hall output voltage is higher than 99% in the magnetic flux density range from ±5 mT to ±175 mT. The output equivalent residual offset is 0.48 mT and the static power consumption is 20 mW. PMID:26516864

  19. An All-Solution-Based Hybrid CMOS-Like Quantum Dot/Carbon Nanotube Inverter.

    PubMed

    Shulga, Artem G; Derenskyi, Vladimir; Salazar-Rios, Jorge Mario; Dirin, Dmitry N; Fritsch, Martin; Kovalenko, Maksym V; Scherf, Ullrich; Loi, Maria A

    2017-09-01

    The development of low-cost, flexible electronic devices is subordinated to the advancement in solution-based and low-temperature-processable semiconducting materials, such as colloidal quantum dots (QDs) and single-walled carbon nanotubes (SWCNTs). Here, excellent compatibility of QDs and SWCNTs as a complementary pair of semiconducting materials for fabrication of high-performance complementary metal-oxide-semiconductor (CMOS)-like inverters is demonstrated. The n-type field effect transistors (FETs) based on I(-) capped PbS QDs (Vth = 0.2 V, on/off = 10(5) , SS-th = 114 mV dec(-1) , µe = 0.22 cm(2) V(-1) s(-1) ) and the p-type FETs with tailored parameters based on low-density random network of SWCNTs (Vth = -0.2 V, on/off > 10(5) , SS-th = 63 mV dec(-1) , µh = 0.04 cm(2) V(-1) s(-1) ) are integrated on the same substrate in order to obtain high-performance hybrid inverters. The inverters operate in the sub-1 V range (0.9 V) and have high gain (76 V/V), large maximum-equal-criteria noise margins (80%), and peak power consumption of 3 nW, in combination with low hysteresis (10 mV). © 2017 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  20. CMOS device and interconnect technology enhancements for low power/low voltage applications

    NASA Astrophysics Data System (ADS)

    Vasudev, P. K.

    1996-04-01

    This paper reviews current advances and future directions in the development of scaled CMOS device technologies on bulk and SOI substrates, and multilevel interconnect architectures for application to low power/low voltage ULSI. Although traditional device scaling (as per the SIA roadmap) calls for the concomitant reduction in device sizes and power supplies driven by DRAM technology generations, the achievement of ultra-low power dissipation (at Vdd ≈ 1 V or less) and high speed performance (for battery operated portable systems) will accelerate scaling and drive several new engineered structures, such as vertically modulated channel doping profiles, ultra-shallow source/drain junctions and ultra-thin SOI devices that are tailored for low voltages. In addition, the development of novel low temperature processing schemes, such as Damascene, will be accelerated for integrating low K dielectrics with Al or Cu metallizations for multilevel interconnect architectures that are designed for low power. The successful incorporation of these technologies into portable electronics systems of the coming decade will require meeting the timing, manufacturability, cost and performance goals, in concert with the SIA roadmap.

  1. Impact of time-dependent annealing on TiO2 films for CMOS application

    NASA Astrophysics Data System (ADS)

    Gyanan, Mondal, Sandip; Kumar, Arvind

    2017-05-01

    Post-deposition annealing (PDA) is the inherent part of sol-gel fabrication process to achieve the optimum device performance, especially in CMOS applications. The annealing removes the oxygen vacancies and improves the structural order of dielectric films. The process also reduces the interface related defects and improves the interfacial properties. In this work, we have integrated the sol-gel spin-coating deposited high-κ TiO2 films in MOS. The films are fired at 400°C for the duration of 20, 40, 60 and 80 min. The thicknesses of the films were found to be of ˜ 30 nm using ellipsometry. The (Al/TiO2/p-Si) devices were examined with current-voltage (I-V) and capacitance-voltage (C-V) at room temperature to understand the influence of firing time. The C-V and I-V characteristic showed a significant dependence on annealing time such as variation in dielectric constant and leakage current. The accumulation capacitance (Cox), dielectric constant (κ) and the equivalent oxide thickness (EOT) of the film fired for 60 min were found to be 458 pF, 33, and 4.25nm, respectively with a low leakage current density (1.09 × 10-6 A/cm2) fired for 80 min at +1 V.

  2. Contact CMOS imaging of gaseous oxygen sensor array

    PubMed Central

    Daivasagaya, Daisy S.; Yao, Lei; Yi Yung, Ka; Hajj-Hassan, Mohamad; Cheung, Maurice C.; Chodavarapu, Vamsy P.; Bright, Frank V.

    2014-01-01

    We describe a compact luminescent gaseous oxygen (O2) sensor microsystem based on the direct integration of sensor elements with a polymeric optical filter and placed on a low power complementary metal-oxide semiconductor (CMOS) imager integrated circuit (IC). The sensor operates on the measurement of excited-state emission intensity of O2-sensitive luminophore molecules tris(4,7-diphenyl-1,10-phenanthroline) ruthenium(II) ([Ru(dpp)3]2+) encapsulated within sol–gel derived xerogel thin films. The polymeric optical filter is made with polydimethylsiloxane (PDMS) that is mixed with a dye (Sudan-II). The PDMS membrane surface is molded to incorporate arrays of trapezoidal microstructures that serve to focus the optical sensor signals on to the imager pixels. The molded PDMS membrane is then attached with the PDMS color filter. The xerogel sensor arrays are contact printed on top of the PDMS trapezoidal lens-like microstructures. The CMOS imager uses a 32 × 32 (1024 elements) array of active pixel sensors and each pixel includes a high-gain phototransistor to convert the detected optical signals into electrical currents. Correlated double sampling circuit, pixel address, digital control and signal integration circuits are also implemented on-chip. The CMOS imager data is read out as a serial coded signal. The CMOS imager consumes a static power of 320 µW and an average dynamic power of 625 µW when operating at 100 Hz sampling frequency and 1.8 V DC. This CMOS sensor system provides a useful platform for the development of miniaturized optical chemical gas sensors. PMID:24493909

  3. CMOS in-pixel optical pulse frequency modulator

    NASA Astrophysics Data System (ADS)

    Nel, Nicolaas E.; du Plessis, M.; Joubert, T.-H.

    2016-02-01

    This paper covers the design of a complementary metal oxide semiconductor (CMOS) pixel readout circuit with a built-in frequency conversion feature. The pixel contains a CMOS photo sensor along with all signal-to-frequency conversion circuitry. An 8×8 array of these pixels is also designed. Current imaging arrays often use analog-to-digital conversion (ADC) and digital signal processing (DSP) techniques that are off-chip1. The frequency modulation technique investigated in this paper is preferred over other ADC techniques due to its smaller size, and the possibility of a higher dynamic range. Careful considerations are made regarding the size of the components of the pixel, as various characteristics of CMOS devices are limited by decreasing the scale of the components2. The methodology used was the CMOS design cycle for integrated circuit design. All components of the pixel were designed from first principles to meet necessary requirements of a small pixel size (30×30 μm2) and an output resolution greater than that of an 8-bit ADC. For the photodetector, an n+-p+/p-substrate diode was designed with a parasitic capacitance of 3 fF. The analog front-end stage was designed around a Schmitt trigger circuit. The photo current is integrated on an integration capacitor of 200 fF, which is reset when the Schmitt trigger output voltage exceeds a preset threshold. The circuit schematic and layout were designed using Cadence Virtuoso and the process used was the AMS CMOS 350 nm process using a power supply of 5V. The simulation results were confirmed to comply with specifications, and the layout passed all verification checks. The dynamic range achieved is 58.828 dB per pixel, with the output frequencies ranging from 12.341kHz to 10.783 MHz. It is also confirmed that the output frequency has a linear relationship to the photocurrent generated by the photodiode.

  4. Contact CMOS imaging of gaseous oxygen sensor array.

    PubMed

    Daivasagaya, Daisy S; Yao, Lei; Yi Yung, Ka; Hajj-Hassan, Mohamad; Cheung, Maurice C; Chodavarapu, Vamsy P; Bright, Frank V

    2011-10-01

    We describe a compact luminescent gaseous oxygen (O2) sensor microsystem based on the direct integration of sensor elements with a polymeric optical filter and placed on a low power complementary metal-oxide semiconductor (CMOS) imager integrated circuit (IC). The sensor operates on the measurement of excited-state emission intensity of O2-sensitive luminophore molecules tris(4,7-diphenyl-1,10-phenanthroline) ruthenium(II) ([Ru(dpp)3](2+)) encapsulated within sol-gel derived xerogel thin films. The polymeric optical filter is made with polydimethylsiloxane (PDMS) that is mixed with a dye (Sudan-II). The PDMS membrane surface is molded to incorporate arrays of trapezoidal microstructures that serve to focus the optical sensor signals on to the imager pixels. The molded PDMS membrane is then attached with the PDMS color filter. The xerogel sensor arrays are contact printed on top of the PDMS trapezoidal lens-like microstructures. The CMOS imager uses a 32 × 32 (1024 elements) array of active pixel sensors and each pixel includes a high-gain phototransistor to convert the detected optical signals into electrical currents. Correlated double sampling circuit, pixel address, digital control and signal integration circuits are also implemented on-chip. The CMOS imager data is read out as a serial coded signal. The CMOS imager consumes a static power of 320 µW and an average dynamic power of 625 µW when operating at 100 Hz sampling frequency and 1.8 V DC. This CMOS sensor system provides a useful platform for the development of miniaturized optical chemical gas sensors.

  5. Design and characterization of high precision in-pixel discriminators for rolling shutter CMOS pixel sensors with full CMOS capability

    NASA Astrophysics Data System (ADS)

    Fu, Y.; Hu-Guo, C.; Dorokhov, A.; Pham, H.; Hu, Y.

    2013-07-01

    In order to exploit the ability to integrate a charge collecting electrode with analog and digital processing circuitry down to the pixel level, a new type of CMOS pixel sensors with full CMOS capability is presented in this paper. The pixel array is read out based on a column-parallel read-out architecture, where each pixel incorporates a diode, a preamplifier with a double sampling circuitry and a discriminator to completely eliminate analog read-out bottlenecks. The sensor featuring a pixel array of 8 rows and 32 columns with a pixel pitch of 80 μm×16 μm was fabricated in a 0.18 μm CMOS process. The behavior of each pixel-level discriminator isolated from the diode and the preamplifier was studied. The experimental results indicate that all in-pixel discriminators which are fully operational can provide significant improvements in the read-out speed and the power consumption of CMOS pixel sensors.

  6. An RF Energy Harvester System Using UHF Micropower CMOS Rectifier Based on a Diode Connected CMOS Transistor

    PubMed Central

    Shokrani, Mohammad Reza; Hamidon, Mohd Nizar B.; Rokhani, Fakhrul Zaman; Shafie, Suhaidi Bin

    2014-01-01

    This paper presents a new type diode connected MOS transistor to improve CMOS conventional rectifier's performance in RF energy harvester systems for wireless sensor networks in which the circuits are designed in 0.18 μm TSMC CMOS technology. The proposed diode connected MOS transistor uses a new bulk connection which leads to reduction in the threshold voltage and leakage current; therefore, it contributes to increment of the rectifier's output voltage, output current, and efficiency when it is well important in the conventional CMOS rectifiers. The design technique for the rectifiers is explained and a matching network has been proposed to increase the sensitivity of the proposed rectifier. Five-stage rectifier with a matching network is proposed based on the optimization. The simulation results shows 18.2% improvement in the efficiency of the rectifier circuit and increase in sensitivity of RF energy harvester circuit. All circuits are designed in 0.18 μm TSMC CMOS technology. PMID:24782680

  7. Rationally Targeted Mutations at the V1V2 Domain of the HIV-1 Envelope to Augment Virus Neutralization by Anti-V1V2 Monoclonal Antibodies

    PubMed Central

    Shen, Guomiao; Upadhyay, Chitra; Zhang, Jing; Pan, Ruimin; Zolla-Pazner, Susan; Kong, Xiang-Peng; Hioe, Catarina E.

    2015-01-01

    HIV-1 envelope glycoproteins (Env) are the only viral antigens present on the virus surface and serve as the key targets for virus-neutralizing antibodies. However, HIV-1 deploys multiple strategies to shield the vulnerable sites on its Env from neutralizing antibodies. The V1V2 domain located at the apex of the HIV-1 Env spike is known to encompass highly variable loops, but V1V2 also contains immunogenic conserved elements recognized by cross-reactive antibodies. This study evaluates human monoclonal antibodies (mAbs) against V2 epitopes which overlap with the conserved integrin α4β7-binding LDV/I motif, designated as the V2i (integrin) epitopes. We postulate that the V2i Abs have weak or no neutralizing activities because the V2i epitopes are often occluded from antibody recognition. To gain insights into the mechanisms of the V2i occlusion, we evaluated three elements at the distal end of the V1V2 domain shown in the structure of V2i epitope complexed with mAb 830A to be important for antibody recognition of the V2i epitope. Amino-acid substitutions at position 179 that restore the LDV/I motif had minimal effects on virus sensitivity to neutralization by most V2i mAbs. However, a charge change at position 153 in the V1 region significantly increased sensitivity of subtype C virus ZM109 to most V2i mAbs. Separately, a disulfide bond introduced to stabilize the hypervariable region of V2 loop also enhanced virus neutralization by some V2i mAbs, but the effects varied depending on the virus. These data demonstrate that multiple elements within the V1V2 domain act independently and in a virus-dependent fashion to govern the antibody recognition and accessibility of V2i epitopes, suggesting the need for multi-pronged strategies to counter the escape and the shielding mechanisms obstructing the V2i Abs from neutralizing HIV-1. PMID:26491873

  8. Bossung curves: an old technique with a new twist for sub-90-nm nodes

    NASA Astrophysics Data System (ADS)

    Zavecz, Terrence E.

    2006-03-01

    The classic Bossung Curve analysis is the most commonly applied tool of the lithographer. The analysis maps a control surface for critical dimensions (CD's) as a function of the variables of focus and exposure (dose). Most commonly the technique is used to calculate the optimum focus and dose process point that yields the greatest depth-of-focus (DoF) over a tolerable range of exposure latitude. Recent ITRS roadmaps have cited the need to control CD's to less than 4 nm Across-Chip-Linewidth-Variation (ACLV). A closely related requirement to ACLV is the need to properly evaluate the implementation of Optical Proximity Correction (OPC) in the final resist image on the wafer. Calculation of ACLV and the process points are typically addressed with the use of theoretical simulator evaluations of the actinic wavefront and the photoresist's interactions. Engineers frequently prefer the clean results of the simulation over the more cumbersome and less understood perturbations seen in the empirical metrology data resulting in a loss of valuable process control information. Complexity increases when the analysis assumes a super-positioning of the responses of multiple feature-types in the search for an overlapping process window. Until recently, simulations rarely validated design response to the process and never incorporated the characteristics of the exposure tool and reticle. Fortunately empirical Bossung curve calculations can supply valuable tool, process and reticle specific interaction information if the techniques are expanded through the use of spatial and temporal perturbation models of the actinic image wavefront. In this implementation the classic focus-exposure matrix is shown to be a powerful tool for the determination of optimum focus and focus uniformity across the full exposure field. Although not the tool of choice for pupil aberration analysis, the method is the best implementation for determining the behavior of device critical feature response when the constructs of OPC, forbidden-pitch and inherent reticle variability are involved. Improved process performance can be achieved with algorithms that provide a calculation of the optimum focus ridge whose resulting feature response-to-dose curves are more easily traced to simulation. Response surface models are presented and applied to a calculation of the Best Focus surface for the exposure field. Unlike specialty reticles used in defocus error, the Bossung curve maps the response of the reticle specific feature or OPC design and can provide information on errors induced by the lens/optomechanical system of the exposure tool. The Bossung curve delivers several additional response surfaces needed for proper qualification of any exposure-tool and reticle set. These include the ability to contour-map the critical Feature-Best-Focus surface response across the exposure field of the reticle that accounts for feature and process design variations, the Depth-of-Focus uniformity surface for each critical feature across the full exposure, an Isofocal ridge analysis of the process and the associated process perturbation response and the effective dose-uniformity response needed to achieve target feature size uniformity across the exposure. The Feature-Best-Focus response surface is critical to any systemic analysis because it is the optimum estimation of the reticle feature uniformity without the perturbations induced by exposure defocus. It is shown that when combined in the analysis these techniques provide improved and quick full-field and process-range feature control limit and tolerance calculation for new designs. The exposure limits thus calculated can then provide a realistic and stable process control set for use in the classic process window analysis. Finally, by deconvolving the systemic reticle signature, the original data provides a feature-specific analysis of Dose-Uniformity. The dose-maps created in this step can be linked to local variations in MEEF and can be used for IntraField Dose Compensation in advanced exposure tools.

  9. An integrated low-voltage ultra-low-power reconfigurable hardware interface in 0.18-µm CMOS

    NASA Astrophysics Data System (ADS)

    Guo, Zhiyong; Li, Qiang; Liu, Haiqi; Yan, Bo; Li, Guangjun

    2011-06-01

    This article presents an interface application specific integrated circuit (ASIC) adaptable to a wide range of bio- and neuro-signal applications. The chip consists of a low-noise analogue front end (FE) and a successive-approximation analogue-to-digital converter (ADC). The entire analogue signal processing chain is fully differential for better immunity to common mode noise and interferences. To make the interface adaptable to different biopotential signals, the bandwidth and gain of the analogue FE are configurable. The ADC is designed for rail-to-rail operation and the input full-scale is adjustable so that the resolution requirement can be relaxed. Fabricated in 0.18-µm complementary metal oxide semiconductor (CMOS), ? input-referred noise density and more than 100-dB CMRR are obtained. Operating in a 10-bit mode, the ADC exhibits -1/+0.3-LSB DNL and -1.3/+0.8-LSB INL least significant bit integral nonlinearity for 1-V rail-to-rail input. The whole interface integrated circuit (IC) consumes 36 µW from a single 1-V supply, making it suitable for a wide range of low-voltage and low-power bio- and neuro-chip platforms.

  10. Improved Space Object Orbit Determination Using CMOS Detectors

    NASA Astrophysics Data System (ADS)

    Schildknecht, T.; Peltonen, J.; Sännti, T.; Silha, J.; Flohrer, T.

    2014-09-01

    CMOS-sensors, or in general Active Pixel Sensors (APS), are rapidly replacing CCDs in the consumer camera market. Due to significant technological advances during the past years these devices start to compete with CCDs also for demanding scientific imaging applications, in particular in the astronomy community. CMOS detectors offer a series of inherent advantages compared to CCDs, due to the structure of their basic pixel cells, which each contains their own amplifier and readout electronics. The most prominent advantages for space object observations are the extremely fast and flexible readout capabilities, feasibility for electronic shuttering and precise epoch registration, and the potential to perform image processing operations on-chip and in real-time. The major challenges and design drivers for ground-based and space-based optical observation strategies have been analyzed. CMOS detector characteristics were critically evaluated and compared with the established CCD technology, especially with respect to the above mentioned observations. Similarly, the desirable on-chip processing functionalities which would further enhance the object detection and image segmentation were identified. Finally, we simulated several observation scenarios for ground- and space-based sensor by assuming different observation and sensor properties. We will introduce the analyzed end-to-end simulations of the ground- and space-based strategies in order to investigate the orbit determination accuracy and its sensitivity which may result from different values for the frame-rate, pixel scale, astrometric and epoch registration accuracies. Two cases were simulated, a survey using a ground-based sensor to observe objects in LEO for surveillance applications, and a statistical survey with a space-based sensor orbiting in LEO observing small-size debris in LEO. The ground-based LEO survey uses a dynamical fence close to the Earth shadow a few hours after sunset. For the space-based scenario

  11. CMOS VLSI Active-Pixel Sensor for Tracking

    NASA Technical Reports Server (NTRS)

    Pain, Bedabrata; Sun, Chao; Yang, Guang; Heynssens, Julie

    2004-01-01

    An architecture for a proposed active-pixel sensor (APS) and a design to implement the architecture in a complementary metal oxide semiconductor (CMOS) very-large-scale integrated (VLSI) circuit provide for some advanced features that are expected to be especially desirable for tracking pointlike features of stars. The architecture would also make this APS suitable for robotic- vision and general pointing and tracking applications. CMOS imagers in general are well suited for pointing and tracking because they can be configured for random access to selected pixels and to provide readout from windows of interest within their fields of view. However, until now, the architectures of CMOS imagers have not supported multiwindow operation or low-noise data collection. Moreover, smearing and motion artifacts in collected images have made prior CMOS imagers unsuitable for tracking applications. The proposed CMOS imager (see figure) would include an array of 1,024 by 1,024 pixels containing high-performance photodiode-based APS circuitry. The pixel pitch would be 9 m. The operations of the pixel circuits would be sequenced and otherwise controlled by an on-chip timing and control block, which would enable the collection of image data, during a single frame period, from either the full frame (that is, all 1,024 1,024 pixels) or from within as many as 8 different arbitrarily placed windows as large as 8 by 8 pixels each. A typical prior CMOS APS operates in a row-at-a-time ( grolling-shutter h) readout mode, which gives rise to exposure skew. In contrast, the proposed APS would operate in a sample-first/readlater mode, suppressing rolling-shutter effects. In this mode, the analog readout signals from the pixels corresponding to the windows of the interest (which windows, in the star-tracking application, would presumably contain guide stars) would be sampled rapidly by routing them through a programmable diagonal switch array to an on-chip parallel analog memory array. The

  12. High-Voltage-Input Level Translator Using Standard CMOS

    NASA Technical Reports Server (NTRS)

    Yager, Jeremy A.; Mojarradi, Mohammad M.; Vo, Tuan A.; Blalock, Benjamin J.

    2011-01-01

    proposed integrated circuit would translate (1) a pair of input signals having a low differential potential and a possibly high common-mode potential into (2) a pair of output signals having the same low differential potential and a low common-mode potential. As used here, "low" and "high" refer to potentials that are, respectively, below or above the nominal supply potential (3.3 V) at which standard complementary metal oxide/semiconductor (CMOS) integrated circuits are designed to operate. The input common-mode potential could lie between 0 and 10 V; the output common-mode potential would be 2 V. This translation would make it possible to process the pair of signals by use of standard 3.3-V CMOS analog and/or mixed-signal (analog and digital) circuitry on the same integrated-circuit chip. A schematic of the circuit is shown in the figure. Standard 3.3-V CMOS circuitry cannot withstand input potentials greater than about 4 V. However, there are many applications that involve low-differential-potential, high-common-mode-potential input signal pairs and in which standard 3.3-V CMOS circuitry, which is relatively inexpensive, would be the most appropriate circuitry for performing other functions on the integrated-circuit chip that handles the high-potential input signals. Thus, there is a need to combine high-voltage input circuitry with standard low-voltage CMOS circuitry on the same integrated-circuit chip. The proposed circuit would satisfy this need. In the proposed circuit, the input signals would be coupled into both a level-shifting pair and a common-mode-sensing pair of CMOS transistors. The output of the level-shifting pair would be fed as input to a differential pair of transistors. The resulting differential current output would pass through six standoff transistors to be mirrored into an output branch by four heterojunction bipolar transistors. The mirrored differential current would be converted back to potential by a pair of diode-connected transistors

  13. CATS-ISS_L1B_D-M7.1-V2-07

    Atmospheric Science Data Center

    2016-11-16

    CATS-ISS_L1B_D-M7.1-V2-07 The Cloud-Aerosol Transport System (CATS) is a three wavelength, polarization-sensitive lidar that provides ... in the Earth's atmosphere. Project Title:  CATS Discipline:  Clouds Aerosols Version:  ...

  14. CATS-ISS_L1B_N-M7.1-V2-07

    Atmospheric Science Data Center

    2016-11-16

    CATS-ISS_L1B_N-M7.1-V2-07 The Cloud-Aerosol Transport System (CATS) is a three wavelength, polarization-sensitive lidar that provides ... in the Earth's atmosphere. Project Title:  CATS Discipline:  Clouds Aerosols Version:  ...

  15. CATS-ISS_L1B_N-M7.1-V2-04

    Atmospheric Science Data Center

    2016-11-22

    CATS-ISS_L1B_N-M7.1-V2-04 The Cloud-Aerosol Transport System (CATS) is a three wavelength, polarization-sensitive lidar that provides ... in the Earth's atmosphere. Project Title:  CATS Discipline:  Clouds Aerosols Version:  ...

  16. Comparative Immunogenicity of Evolved V1V2-Deleted HIV-1 Envelope Glycoprotein Trimers

    PubMed Central

    Tong, Tommy; van Montfort, Thijs; Eggink, Dirk; Montefiori, David; Olson, William C.; Moore, John P.; Binley, James M.; Berkhout, Ben; Sanders, Rogier W.

    2013-01-01

    Despite almost 30 years of research, no effective vaccine has yet been developed against HIV-1. Probably such a vaccine would need to induce both an effective T cell and antibody response. Any vaccine component focused on inducing humoral immunity requires the HIV-1 envelope (Env) glycoprotein complex as it is the only viral protein exposed on the virion surface. HIV-1 has evolved several mechanisms to evade broadly reactive neutralizing antibodies. One such a mechanism involves variable loop domains, which are highly flexible structures that shield the underlying conserved epitopes. We hypothesized that removal of such loops would increase the exposure and immunogenicity of these conserved regions. Env variable loop deletion however often leads to protein misfolding and aggregation because hydrophobic patches becoming solvent accessible. We have therefore previously used virus evolution to acquire functional Env proteins lacking the V1V2 loop. We then expressed them in soluble (uncleaved) gp140 forms. Three mutants were found to perform optimally in terms of protein expression, stability, trimerization and folding. In this study, we characterized the immune responses to these antigens in rabbits. The V1V2 deletion mutant ΔV1V2.9.VK induced a prominent response directed to epitopes that are not fully available on the other Env proteins tested but that effectively bound and neutralized the ΔV1V2 Env virus. This Env variant also induced more efficient neutralization of the tier 1 virus SF162. The immune refocusing effect was lost after booster immunization with a full-length gp140 protein with intact V1V2 loops. Collectively, this result suggests that deletion of variable domains could alter the specificity of the humoral immune response, but did not result in broad neutralization of neutralization-resistant virus isolates. PMID:23840716

  17. Large-area low-temperature ultrananocrystaline diamond (UNCD) films and integration with CMOS devices for monolithically integrated diamond MEMD/NEMS-CMOS systems.

    SciTech Connect

    Sumant, A.V.; Auciello, O.; Yuan, H.-C; Ma, Z.; Carpick, R. W.; Mancini, D. C.; Univ. of Wisconsin; Univ. of Pennsylvania

    2009-05-01

    Because of exceptional mechanical, chemical, and tribological properties, diamond has a great potential to be used as a material for the development of high-performance MEMS and NEMS such as resonators and switches compatible with harsh environments, which involve mechanical motion and intermittent contact. Integration of such MEMS/NEMS devices with complementary metal oxide semiconductor (CMOS) microelectronics will provide a unique platform for CMOS-driven commercial MEMS/NEMS. The main hurdle to achieve diamond-CMOS integration is the relatively high substrate temperatures (600-800 C) required for depositing conventional diamond thin films, which are well above the CMOS operating thermal budget (400 C). Additionally, a materials integration strategy has to be developed to enable diamond-CMOS integration. Ultrananocrystalline diamond (UNCD), a novel material developed in thin film form at Argonne, is currently the only microwave plasma chemical vapor deposition (MPCVD) grown diamond film that can be grown at 400 C, and still retain exceptional mechanical, chemical, and tribological properties comparable to that of single crystal diamond. We have developed a process based on MPCVD to synthesize UNCD films on up to 200 mm in diameter CMOS wafers, which will open new avenues for the fabrication of monolithically integrated CMOS-driven MEMS/NEMS based on UNCD. UNCD films were grown successfully on individual Si-based CMOS chips and on 200 mm CMOS wafers at 400 C in a MPCVD system, using Ar-rich/CH4 gas mixture. The CMOS devices on the wafers were characterized before and after UNCD deposition. All devices were performing to specifications with very small degradation after UNCD deposition and processing. A threshold voltage degradation in the range of 0.08-0.44V and transconductance degradation in the range of 1.5-9% were observed.

  18. Adaptive Circuits for the 0.5-V Nanoscale CMOS Era

    NASA Astrophysics Data System (ADS)

    Itoh, Kiyoo; Yamaoka, Masanao; Oshima, Takashi

    The minimum operating voltage, Vmin, of nanoscale CMOS LSIs is investigated to breach the 1-V wall that we are facing in the 65-nm device generation, and open the door to the below 0.5-V era. A new method using speed variation is proposed to evaluate Vmin. It shows that Vmin is very sensitive to the lowest necessary threshold voltage, Vt0, of MOSFETs and to threshold-voltage variations, ΔVt, which become more significant with device scaling. There is thus a need for low-Vt0 circuits and ΔVt-immune MOSFETs to reduce Vmin. For memory-rich LSIs, the SRAM block is particularly problematic because it has the highest Vmin. Various techniques are thus proposed to reduce the Vmin: using RAM repair, shortening the data line, up-sizing, and using more relaxed MOSFET scaling. To effectively reduce Vmin of other circuit blocks, dual-Vt0 and dual-VDD circuits using gate-source reverse biasing, temporary activation, and series connection of another small low-Vt0 MOSFET are proposed. They are dynamic logic circuits enabling the power-delay product of the conventional static CMOS inverter to be reduced to 0.09 at a 0.2-V supply, and a DRAM dynamic sense amplifier and power switches operable at below 0.5V. In addition, a fully-depleted structure (FD-SOI) and fin-type structure (FinFET) for Vt-immune MOSFETs are discussed in terms of their low-voltage potential and challenges. As a result, the height up-scalable FinFETs turns out to be quite effective to reduce Vmin to less than 0.5V, if combined with the low-Vt0 circuits. For mixed-signal LSIs, investigation of low-voltage potential of analog circuits, especially for comparators and operational amplifiers, reveals that simple inverter op-amps, in which the low gain and nonlinearity are compensated for by digitally assisted analog designs, are crucial to 0.5-V operations. Finally, it is emphasized that the development of relevant devices and fabrication processes is the key to the achievement of 0.5-V nanoscale LSIs.

  19. Current and Future Challenges in Radiation Effects on CMOS Electronics

    NASA Astrophysics Data System (ADS)

    Dodd, P. E.; Shaneyfelt, M. R.; Schwank, J. R.; Felix, J. A.

    2010-08-01

    Advances in microelectronics performance and density continue to be fueled by the engine of Moore's law. Although lately this engine appears to be running out of steam, recent developments in advanced technologies have brought about a number of challenges and opportunities for their use in radiation environments. For example, while many advanced CMOS technologies have generally shown improving total dose tolerance, single-event effects continue to be a serious concern for highly scaled technologies. In this paper, we examine the impact of recent developments and the challenges they present to the radiation effects community. Topics covered include the impact of technology scaling on radiation response and technology challenges for both total dose and single-event effects. We include challenges for hardening and mitigation techniques at the nanometer scale. Recent developments leading to hardness assurance challenges are covered. Finally, we discuss future radiation effects challenges as the electronics industry looks beyond Moore's law to alternatives to traditional CMOS technologies.

  20. On testing stuck-open faults in CMOS combinational circuits

    NASA Technical Reports Server (NTRS)

    Chandramouli, R.

    1982-01-01

    Recently it has been found that a class of failure related to a particular technology (CMOS) cannot be modelled as the conventional stuck-at fault model. These failures change the combinational behavior of CMOS logic gates into a sequential one. Such a failure is modelled as a fault, called the Stuck-Open fault (SOP). The object of this paper is to develop a procedure to detect single SOPs in combinational circuits. It is shown, that in general, tests generated for stuck-at faults when applied in a particular sequence will detect all single SOP faults. In case of single redundancy in the network, the SOP fault on the redundant line cannot be detected. When there is reconvergent fan-out in the network, there is a one-one correspondence between the conditions for stuck-at fault and stuck-open fault detectability.

  1. Radiation Hard 0.13 Micron CMOS Library at IHP

    NASA Astrophysics Data System (ADS)

    Jagdhold, U.

    2013-08-01

    To support space applications we have developed an 0.13 micron CMOS library which should be radiation hard up to 200 krad. The article describes the concept to come to a radiation hard digital circuit and was introduces in 2010 [1]. By introducing new radiation hard design rules we will minimize IC-level leakage and single event latch-up (SEL). To reduce single event upset (SEU) we add two p-MOS transistors to all flip flops. For reliability reasons we use double contacts in all library elements. The additional rules and the library elements are integrated in our Cadence mixed signal design kit, “Virtuoso” IC6.1 [2]. A test chip is produced with our in house 0.13 micron BiCMOS technology, see Ref. [3]. As next step we will doing radiation tests according the european space agency (ESA) specifications, see Ref. [4], [5].

  2. TID Simulation of Advanced CMOS Devices for Space Applications

    NASA Astrophysics Data System (ADS)

    Sajid, Muhammad

    2016-07-01

    This paper focuses on Total Ionizing Dose (TID) effects caused by accumulation of charges at silicon dioxide, substrate/silicon dioxide interface, Shallow Trench Isolation (STI) for scaled CMOS bulk devices as well as at Buried Oxide (BOX) layer in devices based on Silicon-On-Insulator (SOI) technology to be operated in space radiation environment. The radiation induced leakage current and corresponding density/concentration electrons in leakage current path was presented/depicted for 180nm, 130nm and 65nm NMOS, PMOS transistors based on CMOS bulk as well as SOI process technologies on-board LEO and GEO satellites. On the basis of simulation results, the TID robustness analysis for advanced deep sub-micron technologies was accomplished up to 500 Krad. The correlation between the impact of technology scaling and magnitude of leakage current with corresponding total dose was established utilizing Visual TCAD Genius program.

  3. Monolithic CMOS-MEMS integration for high-g accelerometers

    NASA Astrophysics Data System (ADS)

    Narasimhan, Vinayak; Li, Holden; Tan, Chuan Seng

    2014-10-01

    This paper highlights work-in-progress towards the conceptualization, simulation, fabrication and initial testing of a silicon-germanium (SiGe) integrated CMOS-MEMS high-g accelerometer for military, munition, fuze and shock measurement applications. Developed on IMEC's SiGe MEMS platform, the MEMS offers a dynamic range of 5,000 g and a bandwidth of 12 kHz. The low noise readout circuit adopts a chopper-stabilization technique implementing the CMOS through the TSMC 0.18 µm process. The device structure employs a fully differential split comb-drive set up with two sets of stators and a rotor all driven separately. Dummy structures acting as protective over-range stops were designed to protect the active components when under impacts well above the designed dynamic range.

  4. Micromachined high-performance RF passives in CMOS substrate

    NASA Astrophysics Data System (ADS)

    Li, Xinxin; Ni, Zao; Gu, Lei; Wu, Zhengzheng; Yang, Chen

    2016-11-01

    This review systematically addresses the micromachining technologies used for the fabrication of high-performance radio-frequency (RF) passives that can be integrated into low-cost complementary metal-oxide semiconductor (CMOS)-grade (i.e. low-resistivity) silicon wafers. With the development of various kinds of post-CMOS-compatible microelectromechanical systems (MEMS) processes, 3D structural inductors/transformers, variable capacitors, tunable resonators and band-pass/low-pass filters can be compatibly integrated into active integrated circuits to form monolithic RF system-on-chips. By using MEMS processes, including substrate modifying/suspending and LIGA-like metal electroplating, both the highly lossy substrate effect and the resistive loss can be largely eliminated and depressed, thereby meeting the high-performance requirements of telecommunication applications.

  5. Dark current study for CMOS fully integrated-PIN-photodiodes

    NASA Astrophysics Data System (ADS)

    Teva, Jordi; Jessenig, Stefan; Jonak-Auer, Ingrid; Schrank, Franz; Wachmann, Ewald

    2011-05-01

    PIN photodiodes are semiconductor devices widely used in a huge range of applications, such as photoconductors, charge-coupled devices and pulse oximeters for medical applications. The possibility to combine and to integrate the fabrication of the sensor with its signal conditioning circuitry in a CMOS process allows device miniaturization in addition to enhance its properties lowering the production and assembly costs. This paper presents the design and characterization of silicon based PIN photodiodes integrated in a CMOS commercial process. A high-resistivity, low impurity substrate is chosen as the start material for the PIN photodiode array fabrication in order to fabricate devices with a minimum dark current. The dark current is studied, analyzed and measured for two different starting materials and for different geometries. A model previously proposed is reviewed and compared with experimental data.

  6. A back-illuminated megapixel CMOS image sensor

    NASA Technical Reports Server (NTRS)

    Pain, Bedabrata; Cunningham, Thomas; Nikzad, Shouleh; Hoenk, Michael; Jones, Todd; Wrigley, Chris; Hancock, Bruce

    2005-01-01

    In this paper, we present the test and characterization results for a back-illuminated megapixel CMOS imager. The imager pixel consists of a standard junction photodiode coupled to a three transistor-per-pixel switched source-follower readout [1]. The imager also consists of integrated timing and control and bias generation circuits, and provides analog output. The analog column-scan circuits were implemented in such a way that the imager could be configured to run in off-chip correlated double-sampling (CDS) mode. The imager was originally designed for normal front-illuminated operation, and was fabricated in a commercially available 0.5 pn triple-metal CMOS-imager compatible process. For backside illumination, the imager was thinned by etching away the substrate was etched away in a post-fabrication processing step.

  7. A novel noise optimization technique for inductively degenerated CMOS LNA

    NASA Astrophysics Data System (ADS)

    Zhiqing, Geng; Haiyong, Wang; Nanjian, Wu

    2009-10-01

    This paper proposes a novel noise optimization technique. The technique gives analytical formulae for the noise performance of inductively degenerated CMOS low noise amplifier (LNA) circuits with an ideal gate inductor for a fixed bias voltage and nonideal gate inductor for a fixed power dissipation, respectively, by mathematical analysis and reasonable approximation methods. LNA circuits with required noise figure can be designed effectively and rapidly just by using hand calculations of the proposed formulae. We design a 1.8 GHz LNA in a TSMC 0.25 μm CMOS process. The measured results show a noise figure of 1.6 dB with a forward gain of 14.4 dB at a power consumption of 5 mW, demonstrating that the designed LNA circuits can achieve low noise figure levels at low power dissipation.

  8. Diffuse reflectance measurements using lensless CMOS imaging chip

    NASA Astrophysics Data System (ADS)

    Schelkanova, I.; Pandya, A.; Shah, D.; Lilge, L.; Douplik, A.

    2014-10-01

    To assess superficial epithelial microcirculation, a diagnostic tool should be able to detect the heterogeneity of microvasculature, and to monitor qualitative derangement of perfusion in a diseased condition. Employing a lensless CMOS imaging chip with an RGB Bayer filter, experiments were conducted with a microfluidic platform to obtain diffuse reflectance maps. Haemoglobin (Hb) solution (160 g/l) was injected in the periodic channels (grooves) of the microfluidic phantom which were covered with ~250 μm thick layer of intralipid to obtain a diffusive environment. Image processing was performed on data acquired on the surface of the phantom to evaluate the diffuse reflectance from the subsurface periodic pattern. Thickness of the microfluidic grooves, the wavelength dependent contrast between Hb and the background, and effective periodicity of the grooves were evaluated. Results demonstrate that a lens-less CMOS camera is capable of capturing images of subsurface structures with large field of view.

  9. CMOS nanoelectrode array for all-electrical intracellular electrophysiological imaging

    NASA Astrophysics Data System (ADS)

    Abbott, Jeffrey; Ye, Tianyang; Qin, Ling; Jorgolli, Marsela; Gertner, Rona S.; Ham, Donhee; Park, Hongkun

    2017-05-01

    Developing a new tool capable of high-precision electrophysiological recording of a large network of electrogenic cells has long been an outstanding challenge in neurobiology and cardiology. Here, we combine nanoscale intracellular electrodes with complementary metal-oxide-semiconductor (CMOS) integrated circuits to realize a high-fidelity all-electrical electrophysiological imager for parallel intracellular recording at the network level. Our CMOS nanoelectrode array has 1,024 recording/stimulation 'pixels' equipped with vertical nanoelectrodes, and can simultaneously record intracellular membrane potentials from hundreds of connected in vitro neonatal rat ventricular cardiomyocytes. We demonstrate that this network-level intracellular recording capability can be used to examine the effect of pharmaceuticals on the delicate dynamics of a cardiomyocyte network, thus opening up new opportunities in tissue-based pharmacological screening for cardiac and neuronal diseases as well as fundamental studies of electrogenic cells and their networks.

  10. A Brief Discussion of Radiation Hardening of CMOS Microelectronics

    SciTech Connect

    Myers, D.R.

    1998-12-18

    Commercial microchips work well in their intended environments. However, generic microchips will not fimction correctly if exposed to sufficient amounts of ionizing radiation, the kind that satellites encounter in outer space. Modern CMOS circuits must overcome three specific concerns from ionizing radiation: total-dose, single-event, and dose-rate effects. Minority-carrier devices such as bipolar transistors, optical receivers, and solar cells must also deal with recombination-generation centers caused by displacement damage, which are not major concerns for majority-carrier CMOS devices. There are ways to make the chips themselves more resistant to radiation. This extra protection, called radiation hardening, has been called both a science and an art. Radiation hardening requires both changing the designs of the chips and altering the ways that the chips are manufactured.

  11. Wide modulation bandwidth terahertz detection in 130 nm CMOS technology

    NASA Astrophysics Data System (ADS)

    Nahar, Shamsun; Shafee, Marwah; Blin, Stéphane; Pénarier, Annick; Nouvel, Philippe; Coquillat, Dominique; Safwa, Amr M. E.; Knap, Wojciech; Hella, Mona M.

    2016-11-01

    Design, manufacturing and measurements results for silicon plasma wave transistors based wireless communication wideband receivers operating at 300 GHz carrier frequency are presented. We show the possibility of Si-CMOS based integrated circuits, in which by: (i) specific physics based plasma wave transistor design allowing impedance matching to the antenna and the amplifier, (ii) engineering the shape of the patch antenna through a stacked resonator approach and (iii) applying bandwidth enhancement strategies to the design of integrated broadband amplifier, we achieve an integrated circuit of the 300 GHz carrier frequency receiver for wireless wideband operation up to/over 10 GHz. This is, to the best of our knowledge, the first demonstration of low cost 130 nm Si-CMOS technology, plasma wave transistors based fast/wideband integrated receiver operating at 300 GHz atmospheric window. These results pave the way towards future large scale (cost effective) silicon technology based terahertz wireless communication receivers.

  12. An OTA-based CMOS bandpass filter for NMR applications

    NASA Astrophysics Data System (ADS)

    Shesharaman, K. N.; Kittur, Harish M.

    2012-12-01

    One of the very popular medical imaging techniques used in present-day radiology is the magnetic resonance imaging (MRI) which is based on the phenomenon of nuclear magnetic resonance (NMR) in the hydrogen atoms present in the body. There is ever-increasing research in electronic circuit design for biomedical applications using NMR. Earlier magnetic resonance imagers operated at a magnetic field strength of 0.3 T. The present imagers operate at a magnetic field of 1.5 T, the resonance frequency of the nuclei being 64 MHz. This article presents a CMOS bandpass filter (BPF) design for NMR applications. The overall BPF design is realised in 180 nm CMOS technology which occupies an active area of 24.23 × 33.125 µm2 and consumes 0.165 mW of power from a 1.5 V supply.

  13. A fully integrated CMOS inverse sine circuit for computational systems

    NASA Astrophysics Data System (ADS)

    Seon, Jong-Kug

    2010-08-01

    An inverse trigonometric function generator using CMOS technology is presented and implemented. The development and synthesis of inverse trigonometric functional circuits based on the simple approximation equations are also introduced. The proposed inverse sine function generator has the infinite input range and can be used in many measurement and instrumentation systems. The nonlinearity of less than 2.8% for the entire input range of 0.5 Vp-p with a small-signal bandwidth of 3.2 MHz is achieved. The chip implemented in 0.25 μm CMOS process operates from a single 1.8 V supply. The measured power consumption and the active chip area of the inverse sine function circuit are 350 μW and 0.15 mm2, respectively.

  14. CMOS chip chemical detection system comprising mass-sensitive nanocantilevers

    NASA Astrophysics Data System (ADS)

    Srivastava, Ashok; Soundararajan, Rajiv; Hsu, Jui-Ching

    2006-03-01

    An attempt has been made to design a CMOS single-chip chemical detection system for integrating nanocantilevers with low power readout electronic circuits for the detection of traces (few molecules) of hydrocarbon-based gases in the environment. The design is divided into two following building blocks: nanocantilevers as chemical sensors and readout electronics. Carbon nanotubes (CNT)-based cantilevers have been chosen for high-sensitivity chemical sensing for on-chip integration with the interface electronics. An experimental technique is presented for the fabrication of CNT cantilever beams. Design of a readout interface electronics using a switched capacitor technique is presented in 0.5 μm n-well CMOS process for integrating CNT cantilever sensors.

  15. Fundamental performance differences between CMOS and CCD imagers: Part II

    NASA Astrophysics Data System (ADS)

    Janesick, James; Andrews, James; Tower, John; Grygon, Mark; Elliott, Tom; Cheng, John; Lesser, Michael; Pinter, Jeff

    2007-09-01

    A new class of CMOS imagers that compete with scientific CCDs is presented. The sensors are based on deep depletion backside illuminated technology to achieve high near infrared quantum efficiency and low pixel cross-talk. The imagers deliver very low read noise suitable for single photon counting - Fano-noise limited soft x-ray applications. Digital correlated double sampling signal processing necessary to achieve low read noise performance is analyzed and demonstrated for CMOS use. Detailed experimental data products generated by different pixel architectures (notably 3TPPD, 5TPPD and 6TPG designs) are presented including read noise, charge capacity, dynamic range, quantum efficiency, charge collection and transfer efficiency and dark current generation. Radiation damage data taken for the imagers is also reported.

  16. Smart CMOS image sensor for lightning detection and imaging.

    PubMed

    Rolando, Sébastien; Goiffon, Vincent; Magnan, Pierre; Corbière, Franck; Molina, Romain; Tulet, Michel; Bréart-de-Boisanger, Michel; Saint-Pé, Olivier; Guiry, Saïprasad; Larnaudie, Franck; Leone, Bruno; Perez-Cuevas, Leticia; Zayer, Igor

    2013-03-01

    We present a CMOS image sensor dedicated to lightning detection and imaging. The detector has been designed to evaluate the potentiality of an on-chip lightning detection solution based on a smart sensor. This evaluation is performed in the frame of the predevelopment phase of the lightning detector that will be implemented in the Meteosat Third Generation Imager satellite for the European Space Agency. The lightning detection process is performed by a smart detector combining an in-pixel frame-to-frame difference comparison with an adjustable threshold and on-chip digital processing allowing an efficient localization of a faint lightning pulse on the entire large format array at a frequency of 1 kHz. A CMOS prototype sensor with a 256×256 pixel array and a 60 μm pixel pitch has been fabricated using a 0.35 μm 2P 5M technology and tested to validate the selected detection approach.

  17. Development of CMOS-compatible membrane projection lithography

    NASA Astrophysics Data System (ADS)

    Burckel, D. Bruce; Samora, Sally; Wiwi, Mike; Wendt, Joel R.

    2013-09-01

    Recently we have demonstrated membrane projection lithography (MPL) as a fabrication approach capable of creating 3D structures with sub-micron metallic inclusions for use in metamaterial and plasmonic applications using polymer material systems. While polymers provide several advantages in processing, they are soft and subject to stress-induced buckling. Furthermore, in next generation active photonic structures, integration of photonic components with CMOS electronics is desirable. While the MPL process flow is conceptually simple, it requires matrix, membrane and backfill materials with orthogonal processing deposition/removal chemistries. By transitioning the MPL process flow into an entirely inorganic material set based around silicon and standard CMOS-compatible materials, several elements of silicon microelectronics can be integrated into photonic devices at the unit-cell scale. This paper will present detailed fabrication and characterization data of these materials, emphasizing the processing trade space as well as optical characterization of the resulting structures.

  18. High-performance imagers for space applications: The strong benefits of CMOS image sensors processes

    NASA Astrophysics Data System (ADS)

    Saint-Pé, O.; Magnan, P.; Bréart de Boisanger, M.; Tulet, M.; Davancens, R.; Martin Gonthier, P.; Corbière, F.; Huger, N.

    2009-10-01

    Space community has quickly understood the benefits that CMOS technology can procure for the design and manufacture of image sensors, with respect to CCDs which have been the detector of choice for most optical applications during the last 25 years. On the other hand, a majority of space applications is requesting high electro-optics performances to avoid payload oversizing. This was not reachable by CMOS monolithic devices built with standard mixed signal processes. Since the end of the 90s, foundries have developed outstanding CMOS processes optimised for Image Sensors. Combined with the intrinsic advantages of CMOS, they allow developing powerful imagers for space missions. After explaining specificity of CIS processes, the development of a first generation of CMOS Image Sensors for optical instrument will be detailed. Continuation of this route, thanks to the use of advanced CMOS processes, will then be presented.

  19. Arsenic ion implant energy effects on CMOS gate oxide hardness.

    SciTech Connect

    Dondero, Richard; Headley, Thomas Jeffrey; Young, Ralph Watson; Draper, Bruce Leroy; Shaneyfelt, Marty Ray

    2005-07-01

    Under conditions that were predicted as 'safe' by well-established TCAD packages, radiation hardness can still be significantly degraded by a few lucky arsenic ions reaching the gate oxide during self-aligned CMOS source/drain ion implantation. The most likely explanation is that both oxide traps and interface traps are created when ions penetrate and damage the gate oxide after channeling or traveling along polysilicon grain boundaries during the implantation process.

  20. Integrated CMOS transceiver for indoor optical wireless links

    NASA Astrophysics Data System (ADS)

    Holburn, David M.; Lalithambika, Vinod A.; Joyner, Valencia M.; Samsudin, Rina J.; Mears, Robert J.

    2001-11-01

    The purpose of this work is to develop integrated CMOS designs for optical transceivers at 1.55um wavelength that both meet the current system specification of 155Mb/s and provide a viable upgrade path to higher bit-rates. We present the design and implementation of an integrated multi-channel CMOS transceiver for use in a cellular 155Mb/s Manchester-coded optical wireless link. The receiver is an angle-diversity design and consists of multiple sectors with relatively small field of view; each driving an individual pre-amplifier channel. An on-chip selector selects signals to be passed to the combiner depending on the signal level and external control signals. The outputs of all the selected channels are combined using a current summing junction, implemented using a transconductance-transimpedance approach. In order to achieve a receiver design that will be robust in the face of process variations, an on-chip circuit is provided to maintain the operating point of the amplifier chain. The design has been optimized to achieve -30dBm sensitivity at a BER of 10-9. The CMOS transmitter circuit is tailored to match the electro-optic response of the resonant cavity LEDs being used. The transmitter driver incorporates current-peaking and charge-extraction circuitry using a novel timing generator, and has been designed to achieve rise and fall times of better than 0.2ns. Considerable effort is being directed towards the development of integrated designs which do not require significant numbers of discrete components. The prototype designs are being realised in a 0.7μm commodity mixed-signal CMOS process by Alcatel Microelectronics. We report results from the first prototype multi-channel demonstrator system and discuss future research directions.

  1. Accelerated life testing effects on CMOS microcircuit characteristics, phase 1

    NASA Technical Reports Server (NTRS)

    Maximow, B.

    1976-01-01

    An accelerated life test of sufficient duration to generate a minimum of 50% cumulative failures in lots of CMOS devices was conducted to provide a basis for determining the consistency of activation energy at 250 C. An investigation was made to determine whether any thresholds were exceeded during the high temperature testing, which could trigger failure mechanisms unique to that temperature. The usefulness of the 250 C temperature test as a predictor of long term reliability was evaluated.

  2. Linear dynamic range enhancement in a CMOS imager

    NASA Technical Reports Server (NTRS)

    Pain, Bedabrata (Inventor)

    2008-01-01

    A CMOS imager with increased linear dynamic range but without degradation in noise, responsivity, linearity, fixed-pattern noise, or photometric calibration comprises a linear calibrated dual gain pixel in which the gain is reduced after a pre-defined threshold level by switching in an additional capacitance. The pixel may include a novel on-pixel latch circuit that is used to switch in the additional capacitance.

  3. Hardening of commercial CMOS PROMs with polysilicon fusible links

    NASA Technical Reports Server (NTRS)

    Newman, W. H.; Rauchfuss, J. E.

    1985-01-01

    The method by which a commercial 4K CMOS PROM with polysilicon fuses was hardened and the feasibility of applying this method to a 16K PROM are presented. A description of the process and the necessary minor modifications to the original layout are given. The PROM circuit and discrete device characteristics over radiation to 1000K rad-Si are summarized. The dose rate sensitivity of the 4K PROMs is also presented.

  4. Hybrid CMOS/Nanodevice Integrated Circuits Design and Fabrication

    DTIC Science & Technology

    2008-08-25

    This approach combines a semiconductor transistor system with a nanowire crossbar, with simple two-terminal nanodevices self-assembled at each...hybrid CMOS/nanodevice integrated circuits [10-12]. Such circuit combines a semiconductor transistors system with a nanowire crossbar, with simple two...both with and without embedded metallic clusters), self-assembled molecular monolayers, and thin chalcogenide and crystalline perovskite layers [20

  5. CMOS floating-point vector-arithmetic unit

    NASA Astrophysics Data System (ADS)

    Timmermann, D.; Rix, B.; Hahn, H.; Hosticka, B. J.

    1994-05-01

    This work describes a floating-point arithmetic unit based on the CORDIC algorithm. The unit computes a full set of high level arithmetic and elementary functions: multiplication, division, (co)sine, hyperbolic (co)sine, square root, natural logarithm, inverse (hyperbolic) tangent, vector norm, and phase. The chip has been integrated in 1.6 micron double-metal n-well CMOS technology and achieves a normalized peak performance of 220 MFLOPS.

  6. Performance Analysis of Visible Light Communication Using CMOS Sensors.

    PubMed

    Do, Trong-Hop; Yoo, Myungsik

    2016-02-29

    This paper elucidates the fundamentals of visible light communication systems that use the rolling shutter mechanism of CMOS sensors. All related information involving different subjects, such as photometry, camera operation, photography and image processing, are studied in tandem to explain the system. Then, the system performance is analyzed with respect to signal quality and data rate. To this end, a measure of signal quality, the signal to interference plus noise ratio (SINR), is formulated. Finally, a simulation is conducted to verify the analysis.

  7. CMOS Alcohol Sensor Employing ZnO Nanowire Sensing Films

    NASA Astrophysics Data System (ADS)

    Santra, S.; Ali, S. Z.; Guha, P. K.; Hiralal, P.; Unalan, H. E.; Dalal, S. H.; Covington, J. A.; Milne, W. I.; Gardner, J. W.; Udrea, F.

    2009-05-01

    This paper reports on the utilization of zinc oxide nanowires (ZnO NWs) on a silicon on insulator (SOI) CMOS micro-hotplate for use as an alcohol sensor. The device was designed in Cadence and fabricated in a 1.0 μm SOI CMOS process at XFAB (Germany). The basic resistive gas sensor comprises of a metal micro-heater (made of aluminum) embedded in an ultra-thin membrane. Gold plated aluminum electrodes, formed of the top metal, are used for contacting with the sensing material. This design allows high operating temperatures with low power consumption. The membrane was formed by using deep reactive ion etching. ZnO NWs were grown on SOI CMOS substrates by a simple and low-cost hydrothermal method. A few nanometer of ZnO seed layer was first sputtered on the chips, using a metal mask, and then the chips were dipped in a zinc nitrate hexahydrate and hexamethylenetramine solution at 90° C to grow ZnO NWs. The chemical sensitivity of the on-chip NWs were studied in the presence of ethanol (C2H5OH) vapour (with 10% relative humidity) at two different temperatures: 200 and 250° C (the corresponding power consumptions are only 18 and 22 mW). The concentrations of ethanol vapour were varied from 175-1484 ppm (pers per million) and the maximum response was observed 40% (change in resistance in %) at 786 ppm at 250° C. These preliminary measurements showed that the on-chip deposited ZnO NWs could be a promising material for a CMOS based ethanol sensor.

  8. Light-emitting polymer on CMOS: a new photonic technology?

    NASA Astrophysics Data System (ADS)

    Underwood, Ian; Gourlay, James

    2003-11-01

    A new hybrid optoelectronic technology has been developed which utilizes a very thin layer of light emitting polymer material on a CMOS silicon active-matrix substrate to create a 2-D array of independently programmable optical emitters. The technology has been developed thus far primarily for its use as a microdisplay. Here we detail aspects of device design and characterization. We consider the relevance of the new technology to optical and photonic systems other than displays.

  9. Multi-target electrochemical biosensing enabled by integrated CMOS electronics

    NASA Astrophysics Data System (ADS)

    Rothe, J.; Lewandowska, M. K.; Heer, F.; Frey, O.; Hierlemann, A.

    2011-05-01

    An integrated electrochemical measurement system, based on CMOS technology, is presented, which allows the detection of several analytes in parallel (multi-analyte) and enables simultaneous monitoring at different locations (multi-site). The system comprises a 576-electrode CMOS sensor chip, an FPGA module for chip control and data processing, and the measurement laptop. The advantages of the highly versatile system are demonstrated by two applications. First, a label-free, hybridization-based DNA sensor is enabled by the possibility of large-scale integration in CMOS technology. Second, the detection of the neurotransmitter choline is presented by assembling the chip with biosensor microprobe arrays. The low noise level enables a limit of detection of, e.g., 0.3 µM choline. The fully integrated system is self-contained: it features cleaning, functionalization and measurement functions without the need for additional electrical equipment. With the power supplied by the laptop, the system is very suitable for on-site measurements.

  10. Fully depleted and backside biased monolithic CMOS image sensor

    NASA Astrophysics Data System (ADS)

    Stefanov, Konstantin D.; Clarke, Andrew S.; Holland, Andrew D.

    2016-07-01

    We are presenting a novel concept for a fully depleted, monolithic, pinned photodiode CMOS image sensor using reverse substrate bias. The principle of operation allows the manufacture of backside illuminated CMOS sensors with active thickness in excess of 100 μm. This helps increase the QE at near-IR and soft X-ray wavelengths, while preserving the excellent characteristics associated with the pinned photodiode sensitive elements. Such sensors are relevant to a wide range of applications, including scientific imaging, astronomy, Earth observation and surveillance. A prototype device with 10 μm and 5.4 μm pixels using this concept has been designed and is being manufactured on a 0.18 μm CMOS image sensor process. Only one additional implantation step has been introduced to the normal manufacturing flow to make this device. The paper discusses the design of the sensor and the challenges that had to be overcome to realise it in practice, and in particular the method of achieving full depletion without parasitic substrate currents. It is expected that this new technology can be competitive with modern backside illuminated thick CCDs for use at visible to near-IR telescopes and synchrotron light sources.

  11. CMOS integration of inkjet-printed graphene for humidity sensing

    PubMed Central

    Santra, S.; Hu, G.; Howe, R. C. T.; De Luca, A.; Ali, S. Z.; Udrea, F.; Gardner, J. W.; Ray, S. K.; Guha, P. K.; Hasan, T.

    2015-01-01

    We report on the integration of inkjet-printed graphene with a CMOS micro-electro-mechanical-system (MEMS) microhotplate for humidity sensing. The graphene ink is produced via ultrasonic assisted liquid phase exfoliation in isopropyl alcohol (IPA) using polyvinyl pyrrolidone (PVP) polymer as the stabilizer. We formulate inks with different graphene concentrations, which are then deposited through inkjet printing over predefined interdigitated gold electrodes on a CMOS microhotplate. The graphene flakes form a percolating network to render the resultant graphene-PVP thin film conductive, which varies in presence of humidity due to swelling of the hygroscopic PVP host. When the sensors are exposed to relative humidity ranging from 10–80%, we observe significant changes in resistance with increasing sensitivity from the amount of graphene in the inks. Our sensors show excellent repeatability and stability, over a period of several weeks. The location specific deposition of functional graphene ink onto a low cost CMOS platform has the potential for high volume, economic manufacturing and application as a new generation of miniature, low power humidity sensors for the internet of things. PMID:26616216

  12. Polycrystalline Mercuric Iodide Films on CMOS Readout Arrays

    PubMed Central

    Hartsough, Neal E.; Iwanczyk, Jan S.; Nygard, Einar; Malakhov, Nail; Barber, William C.; Gandhi, Thulasidharan

    2009-01-01

    We have created high-resolution x-ray imaging devices using polycrystalline mercuric iodide (HgI2) films grown directly onto CMOS readout chips using a thermal vapor transport process. Images from prototype 400×400 pixel HgI2-coated CMOS readout chips are presented, where the pixel grid is 30 μm × 30 μm. The devices exhibited sensitivity of 6.2 μC/Rcm2 with corresponding dark current of ∼2.7 nA/cm2, and a 80 μm FWHM planar image response to a 50 μm slit aperture. X-ray CT images demonstrate a point spread function sufficient to obtain a 50 μm spatial resolution in reconstructed CT images at a substantially reduced dose compared to phosphor-coated readouts. The use of CMOS technology allows for small pixels (30 μm), fast readout speeds (8 fps for a 3200×3200 pixel array), and future design flexibility due to the use of well-developed fabrication processes. PMID:20161098

  13. Seamless integration of CMOS and microfluidics using flip chip bonding

    NASA Astrophysics Data System (ADS)

    Welch, David; Blain Christen, Jennifer

    2013-03-01

    We demonstrate the microassembly of PDMS (polydimethylsiloxane) microfluidics with integrated circuits made in complementary metal-oxide-semiconductor (CMOS) processes. CMOS-sized chips are flip chip bonded to a flexible polyimide printed circuit board (PCB) with commercially available solder paste patterned using a SU-8 epoxy. The average resistance of each flip chip bond is negligible and all connections are electrically isolated. PDMS is attached to the flexible polyimide PCB using a combination of oxygen plasma treatment and chemical bonding with 3-aminopropyltriethoxysilane. The total device has a burst pressure of 175 kPA which is limited by the strength of the flip chip attachment. This technique allows the sensor area of the die to act as the bottom of the microfluidic channel. The SU-8 provides a barrier between the pad ring (electrical interface) and the fluids; post-processing is not required on the CMOS die. This assembly method shows great promise for developing analytic systems which combine the strengths of microelectronics and microfluidics into one device.

  14. Low voltage electron multiplying CCD in a CMOS process

    NASA Astrophysics Data System (ADS)

    Dunford, Alice; Stefanov, Konstantin; Holland, Andrew

    2016-07-01

    Low light level and high-speed image sensors as required for space applications can suffer from a decrease in the signal to noise ratio (SNR) due to the photon-starved environment and limitations of the sensor's readout noise. The SNR can be increased by the implementation of Time Delay Integration (TDI) as it allows photoelectrons from multiple exposures to be summed in the charge domain with no added noise. Electron Multiplication (EM) can further improve the SNR and lead to an increase in device performance. However, both techniques have traditionally been confined to Charge Coupled Devices (CCD) due to the efficient charge transfer required. With the increase in demand for CMOS sensors with equivalent or superior functionality and performance, this paper presents findings from the characterisation of a low voltage EMCCD in a CMOS process using advanced design features to increase the electron multiplying gain. By using the CMOS process, it is possible to increase chip integration and functionality and achieve higher readout speeds and reduced pixel size. The presented characterisation results include analysis of the photon transfer curve, the dark current, the electron multiplying gain and analysis of the parameters' dependence on temperature and operating voltage.

  15. CMOS-compatible graphene photodetector covering all optical communication bands

    NASA Astrophysics Data System (ADS)

    Pospischil, Andreas; Humer, Markus; Furchi, Marco M.; Bachmann, Dominic; Guider, Romain; Fromherz, Thomas; Mueller, Thomas

    2013-11-01

    Optical interconnects are becoming attractive alternatives to electrical wiring in intra- and interchip communication links. Particularly, the integration with silicon complementary metal-oxide semiconductor (CMOS) technology has received considerable interest because of the ability of cost-effective integration of electronics and optics on a single chip. Although silicon enables the realization of optical waveguides and passive components, the integration of another, optically absorbing, material is required for photodetection. Traditionally, germanium or compound semiconductors are used for this purpose; however, their integration with silicon technology faces major challenges. Recently, graphene emerged as a viable alternative for optoelectronic applications, including photodetection. Here, we demonstrate an ultra-wideband CMOS-compatible photodetector based on graphene. We achieved a multigigahertz operation over all fibre-optic telecommunication bands beyond the wavelength range of strained germanium photodetectors, the responsivity of which is limited by their bandgap. Our work complements the recent demonstration of a CMOS-integrated graphene electro-optical modulator, and paves the way for carbon-based optical interconnects.

  16. An integrated CMOS detection system for optical short-pulse

    NASA Astrophysics Data System (ADS)

    Kim, Chang-Gun; Hong, Nam-Pyo; Choi, Young-Wan

    2014-03-01

    We present design of a front-end readout system consisting of charge sensitive amplifier (CSA) and pulse shaper for detection of stochastic and ultra-small semiconductor scintillator signal. The semiconductor scintillator is double sided silicon detector (DSSD) or avalanche photo detector (APD) for high resolution and peak signal reliability of γ-ray or X-ray spectroscopy. Such system commonly uses low noise multichannel CSA. Each CSA in multichannel includes continuous reset system based on tens of MΩ and charge-integrating capacitor in feedback loop. The high value feedback resistor requires large area and huge power consumption for integrated circuits. In this paper, we analyze these problems and propose a CMOS short pulse detection system with a novel CSA. The novel CSA is composed of continuous reset system with combination of diode connected PMOS and 100 fF. This structure has linearity with increased input charge quantity from tens of femto-coulomb to pico-coulomb. Also, the front-end readout system includes both slow and fast shapers for detecting CSA output and preventing pile-up distortion. Shaping times of fast and slow shapers are 150 ns and 1.4 μs, respectively. Simulation results of the CMOS detection system for optical short-pulse implemented in 0.18 μm CMOS technology are presented.

  17. From vertex detectors to inner trackers with CMOS pixel sensors

    NASA Astrophysics Data System (ADS)

    Besson, A.; Pérez, A. Pérez; Spiriti, E.; Baudot, J.; Claus, G.; Goffe, M.; Winter, M.

    2017-02-01

    The use of CMOS Pixel Sensors (CPS) for high resolution and low material vertex detectors has been validated with the 2014 and 2015 physics runs of the STAR-PXL detector at RHIC/BNL. This opens the door to the use of CPS for inner tracking devices, with 10-100 times larger sensitive area, which require therefore a sensor design privileging power saving, response uniformity and robustness. The 350 nm CMOS technology used for the STAR-PXL sensors was considered as too poorly suited to upcoming applications like the upgraded ALICE Inner Tracking System (ITS), which requires sensors with one order of magnitude improvement on readout speed and improved radiation tolerance. This triggered the exploration of a deeper sub-micron CMOS technology, Tower-Jazz 180 nm, for the design of a CPS well adapted for the new ALICE-ITS running conditions. This paper reports the R & D results for the conception of a CPS well adapted for the ALICE-ITS.

  18. Cryogenic CMOS circuits for single charge digital readout.

    SciTech Connect

    Gurrieri, Thomas M.; Longoria, Erin Michelle; Eng, Kevin; Carroll, Malcolm S.; Hamlet, Jason R.; Young, Ralph Watson

    2010-03-01

    The readout of a solid state qubit often relies on single charge sensitive electrometry. However the combination of fast and accurate measurements is non trivial due to large RC time constants due to the electrometers resistance and shunt capacitance from wires between the cold stage and room temperature. Currently fast sensitive measurements are accomplished through rf reflectrometry. I will present an alternative single charge readout technique based on cryogenic CMOS circuits in hopes to improve speed, signal-to-noise, power consumption and simplicity in implementation. The readout circuit is based on a current comparator where changes in current from an electrometer will trigger a digital output. These circuits were fabricated using Sandia's 0.35 {micro}m CMOS foundry process. Initial measurements of comparators with an addition a current amplifier have displayed current sensitivities of < 1nA at 4.2K, switching speeds up to {approx}120ns, while consuming {approx}10 {micro}W. I will also discuss an investigation of noise characterization of our CMOS process in hopes to obtain a better understanding of the ultimate limit in signal to noise performance.

  19. CMOS integration of inkjet-printed graphene for humidity sensing.

    PubMed

    Santra, S; Hu, G; Howe, R C T; De Luca, A; Ali, S Z; Udrea, F; Gardner, J W; Ray, S K; Guha, P K; Hasan, T

    2015-11-30

    We report on the integration of inkjet-printed graphene with a CMOS micro-electro-mechanical-system (MEMS) microhotplate for humidity sensing. The graphene ink is produced via ultrasonic assisted liquid phase exfoliation in isopropyl alcohol (IPA) using polyvinyl pyrrolidone (PVP) polymer as the stabilizer. We formulate inks with different graphene concentrations, which are then deposited through inkjet printing over predefined interdigitated gold electrodes on a CMOS microhotplate. The graphene flakes form a percolating network to render the resultant graphene-PVP thin film conductive, which varies in presence of humidity due to swelling of the hygroscopic PVP host. When the sensors are exposed to relative humidity ranging from 10-80%, we observe significant changes in resistance with increasing sensitivity from the amount of graphene in the inks. Our sensors show excellent repeatability and stability, over a period of several weeks. The location specific deposition of functional graphene ink onto a low cost CMOS platform has the potential for high volume, economic manufacturing and application as a new generation of miniature, low power humidity sensors for the internet of things.

  20. CCD/CMOS hybrid FPA for low light level imaging

    NASA Astrophysics Data System (ADS)

    Liu, Xinqiao; Fowler, Boyd A.; Onishi, Steve K.; Vu, Paul; Wen, David D.; Do, Hung; Horn, Stuart

    2005-08-01

    We present a CCD / CMOS hybrid focal plane array (FPA) for low light level imaging applications. The hybrid approach combines the best of CCD imaging characteristics (e.g. high quantum efficiency, low dark current, excellent uniformity, and low pixel cross talk) with the high speed, low power and ultra-low read noise of CMOS readout technology. The FPA is comprised of two CMOS readout integrated circuits (ROIC) that are bump bonded to a CCD imaging substrate. Each ROIC is an array of Capacitive Transimpedence Amplifiers (CTIA) that connect to the CCD columns via indium bumps. The proposed column parallel readout architecture eliminates the slow speed, high noise, and high power limitations of a conventional CCD. This results in a compact, low power, ultra-sensitive solid-state FPA that can be used in low light level applications such as live-cell microscopy and security cameras at room temperature operation. The prototype FPA has a 1280×1024 format with 12-um square pixels. Measured dark current is less than 5.8 pA/cm2 at room temperature and the overall read noise is as low as 2.9e at 30 frames/sec.

  1. Aluminum nitride on titanium for CMOS compatible piezoelectric transducers

    PubMed Central

    Doll, Joseph C; Petzold, Bryan C; Ninan, Biju; Mullapudi, Ravi; Pruitt, Beth L

    2010-01-01

    Piezoelectric materials are widely used for microscale sensors and actuators but can pose material compatibility challenges. This paper reports a post-CMOS compatible fabrication process for piezoelectric sensors and actuators on silicon using only standard CMOS metals. The piezoelectric properties of aluminum nitride (AlN) deposited on titanium (Ti) by reactive sputtering are characterized and microcantilever actuators are demonstrated. The film texture of the polycrystalline Ti and AlN films is improved by removing the native oxide from the silicon substrate in situ and sequentially depositing the films under vacuum to provide a uniform growth surface. The piezoelectric properties for several AlN film thicknesses are measured using laser doppler vibrometry on unpatterned wafers and released cantilever beams. The film structure and properties are shown to vary with thickness, with values of d33f, d31 and d33 of up to 2.9, −1.9 and 6.5 pm V−1, respectively. These values are comparable with AlN deposited on a Pt metal electrode, but with the benefit of a fabrication process that uses only standard CMOS metals. PMID:20333316

  2. Development of CMOS Imager Block for Capsule Endoscope

    NASA Astrophysics Data System (ADS)

    Shafie, S.; Fodzi, F. A. M.; Tung, L. Q.; Lioe, D. X.; Halin, I. A.; Hasan, W. Z. W.; Jaafar, H.

    2014-04-01

    This paper presents the development of imager block to be associated in a capsule endoscopy system. Since the capsule endoscope is used to diagnose gastrointestinal diseases, the imager block must be in small size which is comfortable for the patients to swallow. In this project, a small size 1.5V button battery is used as the power supply while the voltage supply requirements for other components such as microcontroller and CMOS image sensor are higher. Therefore, a voltage booster circuit is proposed to boost up the voltage supply from 1.5V to 3.3V. A low power microcontroller is used to generate control pulses for the CMOS image sensor and to convert the 8-bits parallel data output to serial data to be transmitted to the display panel. The results show that the voltage booster circuit was able to boost the voltage supply from 1.5V to 3.3V. The microcontroller precisely controls the CMOS image sensor to produce parallel data which is then serialized again by the microcontroller. The serial data is then successfully translated to 2fps image and displayed on computer.

  3. Single photon detection and localization accuracy with an ebCMOS camera

    NASA Astrophysics Data System (ADS)

    Cajgfinger, T.; Dominjon, A.; Barbier, R.

    2015-07-01

    The CMOS sensor technologies evolve very fast and offer today very promising solutions to existing issues facing by imaging camera systems. CMOS sensors are very attractive for fast and sensitive imaging thanks to their low pixel noise (1e-) and their possibility of backside illumination. The ebCMOS group of IPNL has produced a camera system dedicated to Low Light Level detection and based on a 640 kPixels ebCMOS with its acquisition system. After reminding the principle of detection of an ebCMOS and the characteristics of our prototype, we confront our camera to other imaging systems. We compare the identification efficiency and the localization accuracy of a point source by four different photo-detection devices: the scientific CMOS (sCMOS), the Charge Coupled Device (CDD), the Electron Multiplying CCD (emCCD) and the Electron Bombarded CMOS (ebCMOS). Our ebCMOS camera is able to identify a single photon source in less than 10 ms with a localization accuracy better than 1 μm. We report as well efficiency measurement and the false positive identification of the ebCMOS camera by identifying more than hundreds of single photon sources in parallel. About 700 spots are identified with a detection efficiency higher than 90% and a false positive percentage lower than 5. With these measurements, we show that our target tracking algorithm can be implemented in real time at 500 frames per second under a photon flux of the order of 8000 photons per frame. These results demonstrate that the ebCMOS camera concept with its single photon detection and target tracking algorithm is one of the best devices for low light and fast applications such as bioluminescence imaging, quantum dots tracking or adaptive optics.

  4. Influence of strain rate on the structure/property of Ti-48Al-1V

    SciTech Connect

    Gray, G.T. III.

    1990-01-01

    While the influence of strain rate on the structure/property response of pure titanium and a variety of titanium alloys has been extensively studied, the effect of strain rate on the stress-strain and deformation response of titanium aluminides remains largely unknown. In this paper, a preliminary study of the effect of strain rate and temperature on the substructure evolution and mechanical response of a (48Al-1V)TiAl alloy is presented. The compressive true stress-true strain response of Ti-48Al-1V was found to depend on both the applied strain rate, varied between 0.001 and 7500 s{sup {minus}1}, and the test temperature, varied between 25 and 700{degree}C. The rate of strain hardening in Ti-48Al-1V is seen to increase with increasing strain rate. The substructure evolution of Ti-48Al-1V was observed to depend on the applied strain rate and temperature of deformation. The substructure of Ti-48Al-1V deformed to {var epsilon} = 0.20 at 0.001 s{sup {minus}1} at 25{degree}C was seen to consist of predominately random dislocation debris and isolated grains containing a high density of stacking faults. The majority of the dislocations appear to be (111) 1/2{l angle}110{r angle} unit type ordinary dislocations which is consistent with previous observations on Ti-48Al. Increasing the rate of deformation at room temperature to 75000 s{sup {minus}1} is seen to increase the density of deformation twins and the overall random dislocation debris density. The substructure of Ti-48Al-1V deformed a at high-strain-rate at elevated temperatures was seen to be quite similar to that observed following high-rate deformation at room temperature except for an even higher incidence of twinning. The defect generation and the rate sensitivity of TiAl are discussed as a function of strain rate and contrasted to that observed in conventional titanium alloys. 34 refs., 8 figs.

  5. CMOS Integrated Single Electron Transistor Electrometry (CMOS-SET) circuit design for nanosecond quantum-bit read-out.

    SciTech Connect

    Gurrieri, Thomas M.; Lilly, Michael Patrick; Carroll, Malcolm S.; Levy, James E.

    2008-08-01

    Novel single electron transistor (SET) read-out circuit designs are described. The circuits use a silicon SET interfaced to a CMOS voltage mode or current mode comparator to obtain a digital read-out of the state of the qubit. The design assumes standard submicron (0.35 um) CMOS SOI technology using room temperature SPICE models. Implications and uncertainties related to the temperature scaling of these models to 100mK operation are discussed. Using this technology, the simulations predict a read-out operation speed of approximately Ins and a power dissipation per cell as low as 2nW for single-shot read-out, which is a significant advantage over currently used radio frequency SET (RF-SET) approaches.

  6. Novel digital logic gate for high-performance CMOS imaging system

    NASA Astrophysics Data System (ADS)

    Chung, Hoon H.; Joo, Youngjoong

    2004-06-01

    In these days, the CMOS image sensors are commonly used in many low resolution applications because the CMOS imaging system has several advantages against the conventional CCD imaging system. However, there are still several problems for the realization of the single-chip CMOS imaging system. One main problem is the substrate coupling noise, which is caused by the digital switching noise. Because the CMOS image sensors share the same substrate with surrounding digital circuit, it is difficult for the CMOS image sensor to get a good performance. In order to investigate the substrate coupling noise effect of the CMOS image sensor, the conventional CMOS logic, C-CBL (Complementary-Current balanced logic) and proposed low switching noise logic are simulated and compared. Consequently, the proposed logic compensates not only the large digital switching noise of conventional CMOS logic ,but also the huge power consumption of the C-CBL. Both the total instantaneous current behaviors on the power supply and the peak-to-peak voltages of the substrate voltage variation (di/dt noise) are investigated. The simulation is performed by AMI 0.5μm CMOS technology.

  7. Inside the Outbreak of the 2009 Influenza A (H1N1)v Virus in Mexico

    PubMed Central

    Zepeda-Lopez, Hector M.; Perea-Araujo, Lizbeth; Miliar-García, Angel; Dominguez-López, Aarón; Xoconostle-Cázarez, Beatriz; Lara-Padilla, Eleazar; Ramírez Hernandez, Jorge A.; Sevilla-Reyes, Edgar; Orozco, Maria Esther; Ahued-Ortega, Armando; Villaseñor-Ruiz, Ignacio; Garcia-Cavazos, Ricardo J.; Teran, Luis M.

    2010-01-01

    Background Influenza viruses pose a threat to human health because of their potential to cause global disease. Between mid March and mid April a pandemic influenza A virus emerged in Mexico. This report details 202 cases of infection of humans with the 2009 influenza A virus (H1N1)v which occurred in Mexico City as well as the spread of the virus throughout the entire country. Methodology and Findings From May 1st to May 5th nasopharyngeal swabs, derived from 751 patients, were collected at 220 outpatient clinics and 28 hospitals distributed throughout Mexico City. Analysis of samples using real time RT-PCR revealed that 202 patients out of the 751 subjects (26.9%) were confirmed to be infected with the new virus. All confirmed cases of human infection with the strain influenza (H1N1)v suffered respiratory symptoms. The greatest number of confirmed cases during the outbreak of the 2009 influenza A (H1N1)v were seen in neighbourhoods on the northeast side of Mexico City including Iztapalapa, Gustavo A. Madero, Iztacalco, and Tlahuac which are the most populated areas in Mexico City. Using these data, together with data reported by the Mexican Secretariat of Health (MSH) to date, we plot the course of influenza (H1N1)v activity throughout Mexico. Conclusions Our data, which is backed up by MSH data, show that the greatest numbers of the 2009 influenza A (H1N1) cases were seen in the most populated areas. We speculate on conditions in Mexico which may have sparked this flu pandemic, the first in 41 years. We accept the hypothesis that high population density and a mass gathering which took in Iztapalapa contributed to the rapid spread of the disease which developed in three peaks of activity throughout the Country. PMID:20949040

  8. Developmental pathway for potent V1V2-directed HIV-neutralizing antibodies

    PubMed Central

    Doria-Rose, Nicole A.; Schramm, Chaim A.; Gorman, Jason; Moore, Penny L.; Bhiman, Jinal N.; DeKosky, Brandon J.; Ernandes, Michael J.; Georgiev, Ivelin S.; Kim, Helen J.; Pancera, Marie; Staupe, Ryan P.; Altae-Tran, Han R.; Bailer, Robert T.; Crooks, Ema T.; Cupo, Albert; Druz, Aliaksandr; Garrett, Nigel J.; Hoi, Kam H.; Kong, Rui; Louder, Mark K.; Longo, Nancy S.; McKee, Krisha; Nonyane, Molati; O’Dell, Sijy; Roark, Ryan S.; Rudicell, Rebecca S.; Schmidt, Stephen D.; Sheward, Daniel J.; Soto, Cinque; Wibmer, Constantinos Kurt; Yang, Yongping; Zhang, Zhenhai; Mullikin, James C.; Binley, James M.; Sanders, Rogier W.; Wilson, Ian A.; Moore, John P.; Ward, Andrew B.; Georgiou, George; Williamson, Carolyn; Abdool Karim, Salim S.; Morris, Lynn; Kwong, Peter D.; Shapiro, Lawrence; Mascola, John R.

    2015-01-01

    Summary Antibodies capable of neutralizing HIV-1 often target variable regions 1 and 2 (V1V2) of the HIV-1 envelope, but the mechanism of their elicitation has been unclear. Here we define the developmental pathway by which such antibodies are generated and acquire the requisite molecular characteristics for neutralization. Twelve somatically related neutralizing antibodies (CAP256-VRC26.01-12) were isolated from CAPRISA-donor CAP256; each antibody contained the protruding tyrosine-sulfated, anionic antigen-binding loop (CDR H3) characteristic of this category of antibodies. Their unmutated ancestor emerged between weeks 30–38 post-infection with a 35-residue CDR H3, and neutralized the virus that superinfected this individual 15 weeks after initial infection. Improved neutralization breadth occurred by week 59 with modest affinity maturation, and was preceded by extensive diversification of the virus population. HIV-1 V1V2-directed neutralizing antibodies can thus develop relatively rapidly through initial selection of B cells with a long CDR H3, and limited subsequent somatic hypermutation, an important vaccine insight. PMID:24590074

  9. Developmental pathway for potent V1V2-directed HIV-neutralizing antibodies.

    PubMed

    Doria-Rose, Nicole A; Schramm, Chaim A; Gorman, Jason; Moore, Penny L; Bhiman, Jinal N; DeKosky, Brandon J; Ernandes, Michael J; Georgiev, Ivelin S; Kim, Helen J; Pancera, Marie; Staupe, Ryan P; Altae-Tran, Han R; Bailer, Robert T; Crooks, Ema T; Cupo, Albert; Druz, Aliaksandr; Garrett, Nigel J; Hoi, Kam H; Kong, Rui; Louder, Mark K; Longo, Nancy S; McKee, Krisha; Nonyane, Molati; O'Dell, Sijy; Roark, Ryan S; Rudicell, Rebecca S; Schmidt, Stephen D; Sheward, Daniel J; Soto, Cinque; Wibmer, Constantinos Kurt; Yang, Yongping; Zhang, Zhenhai; Mullikin, James C; Binley, James M; Sanders, Rogier W; Wilson, Ian A; Moore, John P; Ward, Andrew B; Georgiou, George; Williamson, Carolyn; Abdool Karim, Salim S; Morris, Lynn; Kwong, Peter D; Shapiro, Lawrence; Mascola, John R

    2014-05-01

    Antibodies capable of neutralizing HIV-1 often target variable regions 1 and 2 (V1V2) of the HIV-1 envelope, but the mechanism of their elicitation has been unclear. Here we define the developmental pathway by which such antibodies are generated and acquire the requisite molecular characteristics for neutralization. Twelve somatically related neutralizing antibodies (CAP256-VRC26.01-12) were isolated from donor CAP256 (from the Centre for the AIDS Programme of Research in South Africa (CAPRISA)); each antibody contained the protruding tyrosine-sulphated, anionic antigen-binding loop (complementarity-determining region (CDR) H3) characteristic of this category of antibodies. Their unmutated ancestor emerged between weeks 30-38 post-infection with a 35-residue CDR H3, and neutralized the virus that superinfected this individual 15 weeks after initial infection. Improved neutralization breadth and potency occurred by week 59 with modest affinity maturation, and was preceded by extensive diversification of the virus population. HIV-1 V1V2-directed neutralizing antibodies can thus develop relatively rapidly through initial selection of B cells with a long CDR H3, and limited subsequent somatic hypermutation. These data provide important insights relevant to HIV-1 vaccine development.

  10. Growth of carbon nanotubes on fully processed silicon-on-insulator CMOS substrates.

    PubMed

    Haque, M Samiul; Ali, S Zeeshan; Guha, P K; Oei, S P; Park, J; Maeng, S; Teo, K B K; Udrea, F; Milne, W I

    2008-11-01

    This paper describes the growth of Carbon Nanotubes (CNTs) both aligned and non-aligned on fully processed CMOS substrates containing high temperature tungsten metallization. While the growth method has been demonstrated in fabricating CNT gas sensitive layers for high temperatures SOI CMOS sensors, it can be employed in a variety of applications which require the use of CNTs or other nanomaterials with CMOS electronics. In our experiments we have grown CNTs both on SOI CMOS substrates and SOI CMOS microhotplates (suspended on membranes formed by post-CMOS deep RIE etching). The fully processed SOI substrates contain CMOS devices and circuits and additionally, some wafers contained high current LDMOSFETs and bipolar structures such as Lateral Insulated Gate Bipolar Transistors. All these devices were used as test structures to investigate the effect of additional post-CMOS processing such as CNT growth, membrane formation, high temperature annealing, etc. Electrical characterisation of the devices with CNTs were performed along with SEM and Raman spectroscopy. The CNTs were grown both at low and high temperatures, the former being compatible with Aluminium metallization while the latter being possible through the use of the high temperature CMOS metallization (Tungsten). In both cases we have found that there is no change in the electrical behaviour of the CMOS devices, circuits or the high current devices. A slight degradation of the thermal performance of the CMOS microhotplates was observed due to the extra heat dissipation path created by the CNT layers, but this is expected as CNTs exhibit a high thermal conductance. In addition we also observed that in the case of high temperature CNT growth a slight degradation in the manufacturing yield was observed. This is especially the case where large area membranes with a diameter in excess of 500 microns are used.

  11. Fully depleted CMOS pixel sensor development and potential applications

    SciTech Connect

    Baudot, J.; Kachel, M.

    2015-07-01

    CMOS pixel sensors are often opposed to hybrid pixel sensors due to their very different sensitive layer. In standard CMOS imaging processes, a thin (about 20 μm) low resistivity epitaxial layer acts as the sensitive volume and charge collection is mostly driven by thermal agitation. In contrast, the so-called hybrid pixel technology exploits a thick (typically 300 μm) silicon sensor with high resistivity allowing for the depletion of this volume, hence charges drift toward collecting electrodes. But this difference is fading away with the recent availability of some CMOS imaging processes based on a relatively thick (about 50 μm) high resistivity epitaxial layer which allows for full depletion. This evolution extents the range of applications for CMOS pixel sensors where their known assets, high sensitivity and granularity combined with embedded signal treatment, could potentially foster breakthrough in detection performances for specific scientific instruments. One such domain is the Xray detection for soft energies, typically below 10 keV, where the thin sensitive layer was previously severely impeding CMOS sensor usage. Another application becoming realistic for CMOS sensors, is the detection in environment with a high fluence of non-ionizing radiation, such as hadron colliders. However, when considering highly demanding applications, it is still to be proven that micro-circuits required to uniformly deplete the sensor at the pixel level, do not mitigate the sensitivity and efficiency required. Prototype sensors in two different technologies with resistivity higher than 1 kΩ, sensitive layer between 40 and 50 μm and featuring pixel pitch in the range 25 to 50 μm, have been designed and fabricated. Various biasing architectures were adopted to reach full depletion with only a few volts. Laboratory investigations with three types of sources (X-rays, β-rays and infrared light) demonstrated the validity of the approach with respect to depletion, keeping a

  12. Determining the thermal expansion coefficient of thin films for a CMOS MEMS process using test cantilevers

    NASA Astrophysics Data System (ADS)

    Cheng, Chao-Lin; Tsai, Ming-Han; Fang, Weileun

    2015-02-01

    Many standard CMOS processes, provided by existing foundries, are available. These standard CMOS processes, with stacking of various metal and dielectric layers, have been extensively applied in integrated circuits as well as micro-electromechanical systems (MEMS). It is of importance to determine the material properties of the metal and dielectric films to predict the performance and reliability of micro devices. This study employs an existing approach to determine the coefficients of thermal expansion (CTEs) of metal and dielectric films for standard CMOS processes. Test cantilevers with different stacking of metal and dielectric layers for standard CMOS processes have been designed and implemented. The CTEs of standard CMOS films can be determined from measurements of the out-of-plane thermal deformations of the test cantilevers. To demonstrate the feasibility of the present approach, thin films prepared by the Taiwan Semiconductor Manufacture Company 0.35 μm 2P4M CMOS process are characterized. Eight test cantilevers with different stacking of CMOS layers and an auxiliary Si cantilever on a SOI wafer are fabricated. The equivalent elastic moduli and CTEs of the CMOS thin films including the metal and dielectric layers are determined, respectively, from the resonant frequency and static thermal deformation of the test cantilevers. Moreover, thermal deformations of cantilevers with stacked layers different to those of the test beams have been employed to verify the measured CTEs and elastic moduli.

  13. Integration of GMR-based spin torque oscillators and CMOS circuitry

    NASA Astrophysics Data System (ADS)

    Chen, Tingsu; Eklund, Anders; Sani, Sohrab; Rodriguez, Saul; Malm, B. Gunnar; Åkerman, Johan; Rusu, Ana

    2015-09-01

    This paper demonstrates the integration of giant magnetoresistance (GMR) spin torque oscillators (STO) with dedicated high frequency CMOS circuits. The wire-bonding-based integration approach is employed in this work, since it allows easy implementation, measurement and replacement. A GMR STO is wire-bonded to the dedicated CMOS integrated circuit (IC) mounted on a PCB, forming a (GMR STO + CMOS IC) pair. The GMR STO has a lateral size of 70 nm and more than an octave of tunability in the microwave frequency range. The proposed CMOS IC provides the necessary bias-tee for the GMR STO, as well as electrostatic discharge (ESD) protection and wideband amplification targeting high frequency GMR STO-based applications. It is implemented in a 65 nm CMOS process, offers a measured gain of 12 dB, while consuming only 14.3 mW and taking a total silicon area of 0.329 mm2. The measurement results show that the (GMR STO + CMOS IC) pair has a wide tunability range from 8 GHz to 16.5 GHz and improves the output power of the GMR STO by about 10 dB. This GMR STO-CMOS integration eliminates wave reflections during the signal transmission and therefore exhibits good potential for developing high frequency GMR STO-based applications, which combine the features of CMOS and STO technologies.

  14. Comparison of Total Dose Effects on Micropower Op-Amps: Bipolar and CMOS

    NASA Technical Reports Server (NTRS)

    Lee, C.; Johnston, A.

    1998-01-01

    This paper compares low-paper op-amps, OPA241 (bipolar) and OPA336 (CMOS), from Burr-Brown, MAX473 (bipolar) and MAX409 (CMOS), characterizing their total dose response with a single 2.7V power supply voltage.

  15. Comparison of Total Dose Effects on Micropower Op-Amps: Bipolar and CMOS

    NASA Technical Reports Server (NTRS)

    Lee, C.; Johnston, A.

    1998-01-01

    This paper compares low-paper op-amps, OPA241 (bipolar) and OPA336 (CMOS), from Burr-Brown, MAX473 (bipolar) and MAX409 (CMOS), characterizing their total dose response with a single 2.7V power supply voltage.

  16. BiCMOS circuit technology for a 704 MHz ATM switch LSI

    NASA Astrophysics Data System (ADS)

    Ohtomo, Yusuke; Yasuda, Sadayuki; Togashi, Minoru; Ino, Masayuki; Tanabe, Yasuyuki; Inoue, Jun-Ichi; Nogawa, Masafumi; Hino, Shigeki

    1994-05-01

    This paper describes BiCMOS level-converter circuits and clock circuits that increase VLSI interface speed to 1 GHz, and their application to a 704 MHz ATM switch LSI. An LSI with high speed interface requires a BiCMOS multiplexer/demultiplexer (MUX/DEMUX) on the chip to reduce internal operation speed. A MUX/DEMUX with minimum power dissipation and a minimum pattern area can be designed using the proposed converter circuits. The converter circuits, using weakly cross-coupled CMOS inverters and a voltage regulator circuit, can convert signal levels between LCML and positive CMOS at a speed of 500 MHz. Data synchronization in the high speed region is ensured by a new BiCMOS clock circuit consisting of a pure ECL path and retiming circuits. The clock circuit reduces the chip latency fluctuation of the clock signal and absorbs the delay difference between the ECL clock and data through the CMOS circuits. A rerouting-Banyan (RRB) ATM switch, employing both the proposed converter circuits and the clock circuits, has been fabricated with 0.5 micron BiCMOS technology. The LSI, composed of CMOS 15 K gate LOGIC, 8 Kb RAM, 1 Kb FIFO and ECL 1.6 K gate LOGIC, achieved an operation speed of 704-MHz with power dissipation of 7.2 W.

  17. Design rules for RCA self-aligned silicon-gate CMOS/SOS process

    NASA Technical Reports Server (NTRS)

    1977-01-01

    The CMOS/SOS design rules prepared by the RCA Solid State Technology Center (SSTC) are described. These rules specify the spacing and width requirements for each of the six design levels, the seventh level being used to define openings in the passivation level. An associated report, entitled Silicon-Gate CMOS/SOS Processing, provides further insight into the usage of these rules.

  18. 77 FR 33488 - Certain CMOS Image Sensors and Products Containing Same; Institution of Investigation Pursuant to...

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-06-06

    ... COMMISSION Certain CMOS Image Sensors and Products Containing Same; Institution of Investigation Pursuant to... States after importation of certain CMOS image sensors and products containing same by reason of... image sensors and products containing same that infringe one or more of claims 1 and 2 of the `126...

  19. NV-CMOS HD camera for day/night imaging

    NASA Astrophysics Data System (ADS)

    Vogelsong, T.; Tower, J.; Sudol, Thomas; Senko, T.; Chodelka, D.

    2014-06-01

    SRI International (SRI) has developed a new multi-purpose day/night video camera with low-light imaging performance comparable to an image intensifier, while offering the size, weight, ruggedness, and cost advantages enabled by the use of SRI's NV-CMOS HD digital image sensor chip. The digital video output is ideal for image enhancement, sharing with others through networking, video capture for data analysis, or fusion with thermal cameras. The camera provides Camera Link output with HD/WUXGA resolution of 1920 x 1200 pixels operating at 60 Hz. Windowing to smaller sizes enables operation at higher frame rates. High sensitivity is achieved through use of backside illumination, providing high Quantum Efficiency (QE) across the visible and near infrared (NIR) bands (peak QE <90%), as well as projected low noise (<2h+) readout. Power consumption is minimized in the camera, which operates from a single 5V supply. The NVCMOS HD camera provides a substantial reduction in size, weight, and power (SWaP) , ideal for SWaP-constrained day/night imaging platforms such as UAVs, ground vehicles, fixed mount surveillance, and may be reconfigured for mobile soldier operations such as night vision goggles and weapon sights. In addition the camera with the NV-CMOS HD imager is suitable for high performance digital cinematography/broadcast systems, biofluorescence/microscopy imaging, day/night security and surveillance, and other high-end applications which require HD video imaging with high sensitivity and wide dynamic range. The camera comes with an array of lens mounts including C-mount and F-mount. The latest test data from the NV-CMOS HD camera will be presented.

  20. SOI CMOS Imager with Suppression of Cross-Talk

    NASA Technical Reports Server (NTRS)

    Pain, Bedabrata; Zheng, Xingyu; Cunningham, Thomas J.; Seshadri, Suresh; Sun, Chao

    2009-01-01

    A monolithic silicon-on-insulator (SOI) complementary metal oxide/semiconductor (CMOS) image-detecting integrated circuit of the active-pixel-sensor type, now undergoing development, is designed to operate at visible and near-infrared wavelengths and to offer a combination of high quantum efficiency and low diffusion and capacitive cross-talk among pixels. The imager is designed to be especially suitable for astronomical and astrophysical applications. The imager design could also readily be adapted to general scientific, biological, medical, and spectroscopic applications. One of the conditions needed to ensure both high quantum efficiency and low diffusion cross-talk is a relatively high reverse bias potential (between about 20 and about 50 V) on the photodiode in each pixel. Heretofore, a major obstacle to realization of this condition in a monolithic integrated circuit has been posed by the fact that the required high reverse bias on the photodiode is incompatible with metal oxide/semiconductor field-effect transistors (MOSFETs) in the CMOS pixel readout circuitry. In the imager now being developed, the SOI structure is utilized to overcome this obstacle: The handle wafer is retained and the photodiode is formed in the handle wafer. The MOSFETs are formed on the SOI layer, which is separated from the handle wafer by a buried oxide layer. The electrical isolation provided by the buried oxide layer makes it possible to bias the MOSFETs at CMOS-compatible potentials (between 0 and 3 V), while biasing the photodiode at the required higher potential, and enables independent optimization of the sensory and readout portions of the imager.

  1. A CMOS In-Pixel CTIA High Sensitivity Fluorescence Imager

    PubMed Central

    Murari, Kartikeya; Etienne-Cummings, Ralph; Thakor, Nitish; Cauwenberghs, Gert

    2012-01-01

    Traditionally, charge coupled device (CCD) based image sensors have held sway over the field of biomedical imaging. Complementary metal oxide semiconductor (CMOS) based imagers so far lack sensitivity leading to poor low-light imaging. Certain applications including our work on animal-mountable systems for imaging in awake and unrestrained rodents require the high sensitivity and image quality of CCDs and the low power consumption, flexibility and compactness of CMOS imagers. We present a 132×124 high sensitivity imager array with a 20.1 μm pixel pitch fabricated in a standard 0.5 μ CMOS process. The chip incorporates n-well/p-sub photodiodes, capacitive transimpedance amplifier (CTIA) based in-pixel amplification, pixel scanners and delta differencing circuits. The 5-transistor all-nMOS pixel interfaces with peripheral pMOS transistors for column-parallel CTIA. At 70 fps, the array has a minimum detectable signal of 4 nW/cm2 at a wavelength of 450 nm while consuming 718 μA from a 3.3 V supply. Peak signal to noise ratio (SNR) was 44 dB at an incident intensity of 1 μW/cm2. Implementing 4×4 binning allowed the frame rate to be increased to 675 fps. Alternately, sensitivity could be increased to detect about 0.8 nW/cm2 while maintaining 70 fps. The chip was used to image single cell fluorescence at 28 fps with an average SNR of 32 dB. For comparison, a cooled CCD camera imaged the same cell at 20 fps with an average SNR of 33.2 dB under the same illumination while consuming over a watt. PMID:23136624

  2. Swap intensified WDR CMOS module for I2/LWIR fusion

    NASA Astrophysics Data System (ADS)

    Ni, Yang; Noguier, Vincent

    2015-05-01

    The combination of high resolution visible-near-infrared low light sensor and moderate resolution uncooled thermal sensor provides an efficient way for multi-task night vision. Tremendous progress has been made on uncooled thermal sensors (a-Si, VOx, etc.). It's possible to make a miniature uncooled thermal camera module in a tiny 1cm3 cube with <1W power consumption. For silicon based solid-state low light CCD/CMOS sensors have observed also a constant progress in terms of readout noise, dark current, resolution and frame rate. In contrast to thermal sensing which is intrinsic day&night operational, the silicon based solid-state sensors are not yet capable to do the night vision performance required by defense and critical surveillance applications. Readout noise, dark current are 2 major obstacles. The low dynamic range at high sensitivity mode of silicon sensors is also an important limiting factor, which leads to recognition failure due to local or global saturations & blooming. In this context, the image intensifier based solution is still attractive for the following reasons: 1) high gain and ultra-low dark current; 2) wide dynamic range and 3) ultra-low power consumption. With high electron gain and ultra low dark current of image intensifier, the only requirement on the silicon image pickup device are resolution, dynamic range and power consumption. In this paper, we present a SWAP intensified Wide Dynamic Range CMOS module for night vision applications, especially for I2/LWIR fusion. This module is based on a dedicated CMOS image sensor using solar-cell mode photodiode logarithmic pixel design which covers a huge dynamic range (> 140dB) without saturation and blooming. The ultra-wide dynamic range image from this new generation logarithmic sensor can be used directly without any image processing and provide an instant light accommodation. The complete module is slightly bigger than a simple ANVIS format I2 tube with <500mW power consumption.

  3. Colorectal cancer susceptibility associated with the hMLH1 V384D variant.

    PubMed

    Ohsawa, Tomonori; Sahara, Tomoko; Muramatsu, Shino; Nishimura, Yoji; Yathuoka, Toshimasa; Tanaka, Yoichi; Yamaguchi, Kensei; Ishida, Hideyuki; Akagi, Kiwamu

    2009-01-01

    Lynch syndrome is an autosomal dominant colorectal cancer susceptibility syndrome caused by a dysfunction of DNA mismatch repair genes, including MLH1, MSH2, MSH6 and PMS2. However, the interpretation of certain changes in the mismatch repair genes is perplexing, as these changes do not necessarily affect the function of the protein. The pathogenicity of the hMLH1 1151T↷A variant, which results in an amino-acid substitution of valine for aspartic acid at codon 384 (V384D), is also controversial. This study was undertaken to assess the clinicopathological features of colorectal cancer patients harboring the hMLH1 V384D variant. Two independent Japanese cohorts, comprising 670 colorectal cancer patients and 332 cancer-free controls, respectively, were genotyped by polymerase chain reaction (PCR)-RFLP. The allele frequency of V384D was 0.75% in the control group and 3.1% in the colorectal cancer group (p<0.001). Thus, the V384D variant was associated with increased colorectal cancer susceptibility. However, only 5% of the colorectal cancer patients carrying the V384D variant had high micro-satellite instability; most had microsatellite-stable cancer. Additionally, these patients had no clear familial history of Lynch syndrome-related tumors. The combined results indicate that hMLH1 V384D allele frequency was 4.1-fold higher in the colorectal cancer group than in the control group. Thus, the hMLH1 V384D variant may contribute to the development of microsatellite-instable as well as -stable colorectal cancer.

  4. Stress corrosion cracking of Ti-8Al-1 Mo-1V in molten salts

    NASA Technical Reports Server (NTRS)

    Smyrl, W. H.; Blackburn, M. J.

    1975-01-01

    The stress corrosion cracking (SCC) behavior of Ti-8Al-1 Mo-1V has been studied in several molten salt environments. Extensive data are reported for the alloy in highly pure LiCl-KCl. The influence of the metallurgical heat treatment and texture, and the mechanical microstructure show similarities with aqueous solutions at lower temperature. The fracture path and cracking modes are also similar to that found in other environments. The influence of H2O and H(-) in molten LiCl-KCl lead to the conclusion that hydrogen does not play a major role in crack extension in this environment.

  5. Silicide Nanowires for Low-Resistance CMOS Transistor Contacts.

    NASA Astrophysics Data System (ADS)

    Zollner, Stefan

    2007-03-01

    Transition metal (TM) silicide nanowires are used as contacts for modern CMOS transistors. (Our smallest wires are ˜20 nm thick and ˜50 nm wide.) While much research on thick TM silicides was conducted long ago, materials perform differently at the nanoscale. For example, the usual phase transformation sequences (e.g., Ni, Ni2Si, NiSi, NiSi2) for the reaction of thick metal films on Si no longer apply to nanostructures, because the surface and interface energies compete with the bulk energy of a given crystal structure. Therefore, a NiSi film will agglomerate into hemispherical droplets of NiSi by annealing before it reaches the lowest-energy (NiSi2) crystalline structure. These dynamics can be tuned by addition of impurities (such as Pt in Ni). The Si surface preparation is also a more important factor for nanowires than for silicidation of thick TM films. Ni nanowires formed on Si surfaces that were cleaned and amorphized by sputtering with Ar ions have a tendency to form NiSi2 pyramids (``spikes'') even at moderate temperatures (˜400^oC), while similar Ni films formed on atomically clean or hydrogen-terminated Si form uniform NiSi nanowires. Another issue affecting TM silicides is the barrier height between the silicide contact and the silicon transistor. For most TM silicides, the Fermi level of the silicide is aligned with the center of the Si band gap. Therefore, silicide contacts experience Schottky barrier heights of around 0.5 eV for both n-type and p-type Si. The resulting contact resistance becomes a significant term for the overall resistance of modern CMOS transistors. Lowering this contact resistance is an important goal in CMOS research. New materials are under investigation (for example PtSi, which has a barrier height of only 0.3 eV to p-type Si). This talk will describe recent results, with special emphasis on characterization techniques and electrical testing useful for the development of silicide nanowires for CMOS contacts. In collaboration

  6. Test of radiation hardness of CMOS transistors under neutron irradiation

    SciTech Connect

    Sadrozinski, H.F.W.; Rowe, W.A.; Seiden, A.; Spencer, E.; Hoffman, C.M.; Holtkamp, D.; Kinnison, W.W.; Sommer, W.F. Jr.; Ziock, H.J.

    1989-01-01

    We have tested 2 micron CMOS test structures from various foundries in the LAMPF Beam stop for radiation damage under prolongued neutron irradiation. The fluxes employed covered the region expected to be encountered at the SSC and led to fluences of up to 10/sup 14/ neutrons/cm/sup 2/ in about 500 hrs of running. We show that test structures which have been measured to survive ionizing radiation of the order MRad also survive these high neutron fluences. 5 refs., 4 figs.

  7. Design and optimization of BCCD in CMOS technology

    NASA Astrophysics Data System (ADS)

    Gao, Jing; Li, Yi; Gao, Zhi-yuan; Luo, Tao

    2016-09-01

    This paper optimizes the buried channel charge-coupled device (BCCD) structure fabricated by complementary metal oxide semiconductor (CMOS) technology. The optimized BCCD has advantages of low noise, high integration and high image quality. The charge transfer process shows that interface traps, weak fringing fields and potential well between adjacent gates all cause the decrease of charge transfer efficiency ( CTE). CTE and well capacity are simulated with different operating voltages and gap sizes. CTE can achieve 99.999% and the well capacity reaches up to 25 000 electrons for the gap size of 130 nm and the maximum operating voltage of 3 V.

  8. A quasi-passive CMOS pipeline D/A converter

    NASA Technical Reports Server (NTRS)

    Wang, Fong-Jim; Temes, Gabor C.; Law, Simon

    1989-01-01

    A novel pipeline digital-to-analog converter configuration, based on switched-capacitor techniques, is described. An n-bit D/A conversion can be implemented by cascading n + 1 unit cells. The device count of the circuit increases linearly, not exponentially, with the conversion accuracy. The new configuration can be pipelined. Hence, the conversion rate can be increased without requiring a higher clock rate. An experimental 10-bit DAC prototype has been fabricated using a 3-micron CMOS process. The results show that high-speed, high-accuracy, and low-power operation can be achieved without special process or postprocess trimming.

  9. 120-MHz BiCMOS superscalar RISC processor

    NASA Astrophysics Data System (ADS)

    Tanaka, Shigeya; Hotta, Takashi; Murabayashi, Fumio; Yamada, Hiromichi; Yoshida, Shoji; Shimamura, Kotaro; Katsura, Koyo; Bandoh, Tadaaki; Ikeda, Koichi; Matsubara, Kenji

    1994-04-01

    A superscalar RISC processor contains 2.8 million transistors in a die size of 16.2 mm x 16.5 mm, and utilizes 3.3 V/0.5 micron BiCMOS technology. In order to take advantage of superscalar performance without incurring penalties from a slower clock or a longer pipeline, a tag bit is implemented in the instruction cache to indicate dependency between two instructions. A performance gain of up to 37% is obtained with only a 3.5% area overhead from our superscalar design.

  10. Fabrication and Characterization of a CMOS-MEMS Humidity Sensor

    PubMed Central

    Dennis, John-Ojur; Ahmed, Abdelaziz-Yousif; Khir, Mohd-Haris

    2015-01-01

    This paper reports on the fabrication and characterization of a Complementary Metal Oxide Semiconductor-Microelectromechanical System (CMOS-MEMS) device with embedded microheater operated at relatively elevated temperatures (40 °C to 80 °C) for the purpose of relative humidity measurement. The sensing principle is based on the change in amplitude of the device due to adsorption or desorption of humidity on the active material layer of titanium dioxide (TiO2) nanoparticles deposited on the moving plate, which results in changes in the mass of the device. The sensor has been designed and fabricated through a standard 0.35 µm CMOS process technology and post-CMOS micromachining technique has been successfully implemented to release the MEMS structures. The sensor is operated in the dynamic mode using electrothermal actuation and the output signal measured using a piezoresistive (PZR) sensor connected in a Wheatstone bridge circuit. The output voltage of the humidity sensor increases from 0.585 mV to 30.580 mV as the humidity increases from 35% RH to 95% RH. The output voltage is found to be linear from 0.585 mV to 3.250 mV as the humidity increased from 35% RH to 60% RH, with sensitivity of 0.107 mV/% RH; and again linear from 3.250 mV to 30.580 mV as the humidity level increases from 60% RH to 95% RH, with higher sensitivity of 0.781 mV/% RH. On the other hand, the sensitivity of the humidity sensor increases linearly from 0.102 mV/% RH to 0.501 mV/% RH with increase in the temperature from 40 °C to 80 °C and a maximum hysteresis of 0.87% RH is found at a relative humidity of 80%. The sensitivity is also frequency dependent, increasing from 0.500 mV/% RH at 2 Hz to reach a maximum value of 1.634 mV/% RH at a frequency of 12 Hz, then decreasing to 1.110 mV/% RH at a frequency of 20 Hz. Finally, the CMOS-MEMS humidity sensor showed comparable response, recovery, and repeatability of measurements in three cycles as compared to a standard sensor that directly

  11. Widefield heterodyne interferometry using a custom CMOS modulated light camera.

    PubMed

    Patel, Rikesh; Achamfuo-Yeboah, Samuel; Light, Roger; Clark, Matt

    2011-11-21

    In this paper a method of taking widefield heterodyne interferograms using a prototype modulated light camera is described. This custom CMOS modulated light camera (MLC) uses analogue quadrature demodulation at each pixel to output the phase and amplitude of the modulated light as DC voltages. The heterodyne interference fringe patterns are generated using an acousto-optical frequency shifter (AOFS) in an arm of a Mach-Zehnder interferometer. Widefield images of fringe patterns acquired using the prototype MLC are presented. The phase can be measured to an accuracy of ±6.6°. The added value of this method to acquire widefield images are discussed along with the advantages.

  12. A high speed CMOS A/D converter

    NASA Technical Reports Server (NTRS)

    Wiseman, Don R.; Whitaker, Sterling R.

    1992-01-01

    This paper presents a high speed analog-to-digital (A/D) converter. The converter is a 7 bit flash converter with one half LSB accuracy. Typical parts will function at approximately 200 MHz. The converter uses a novel comparator circuit that is shown to out perform more traditional comparators, and thus increases the speed of the converter. The comparator is a clocked, precharged circuit that offers very fast operation with a minimal offset voltage (2 mv). The converter was designed using a standard 1 micron digital CMOS process and is 2,244 microns by 3,972 microns.

  13. Autonomous pedestrian localization technique using CMOS camera sensors

    NASA Astrophysics Data System (ADS)

    Chun, Chanwoo

    2014-09-01

    We present a pedestrian localization technique that does not need infrastructure. The proposed angle-only measurement method needs specially manufactured shoes. Each shoe has two CMOS cameras and two markers such as LEDs attached on the inward side. The line of sight (LOS) angles towards the two markers on the forward shoe are measured using the two cameras on the other rear shoe. Our simulation results shows that a pedestrian walking down in a shopping mall wearing this device can be accurately guided to the front of a destination store located 100m away, if the floor plan of the mall is available.

  14. Defect classes - an overdue paradigm for CMOS IC testing

    SciTech Connect

    Hawkins, C.F.; Soden, J.M.; Righter, A.W.; Ferguson, F.J.

    1994-09-01

    The IC test industry has struggled for more than 30 years to establish a test approach that would guarantee a low defect level to the customer. We propose a comprehensive strategy for testing CMOS ICs that uses defect classes based on measured defect electrical properties. Defect classes differ from traditional fault models. Our defect class approach requires that the test strategy match the defect electrical properties, while fault models require that IC defects match the fault definition. We use data from Sandia Labs failure analysis and test facilities and from public literature. We describe test pattern requirements for each defect class and propose a test paradigm.

  15. Fabrication and Characterization of a CMOS-MEMS Humidity Sensor.

    PubMed

    Dennis, John-Ojur; Ahmed, Abdelaziz-Yousif; Khir, Mohd-Haris

    2015-07-10

    This paper reports on the fabrication and characterization of a Complementary Metal Oxide Semiconductor-Microelectromechanical System (CMOS-MEMS) device with embedded microheater operated at relatively elevated temperatures (40 °C to 80 °C) for the purpose of relative humidity measurement. The sensing principle is based on the change in amplitude of the device due to adsorption or desorption of humidity on the active material layer of titanium dioxide (TiO2) nanoparticles deposited on the moving plate, which results in changes in the mass of the device. The sensor has been designed and fabricated through a standard 0.35 µm CMOS process technology and post-CMOS micromachining technique has been successfully implemented to release the MEMS structures. The sensor is operated in the dynamic mode using electrothermal actuation and the output signal measured using a piezoresistive (PZR) sensor connected in a Wheatstone bridge circuit. The output voltage of the humidity sensor increases from 0.585 mV to 30.580 mV as the humidity increases from 35% RH to 95% RH. The output voltage is found to be linear from 0.585 mV to 3.250 mV as the humidity increased from 35% RH to 60% RH, with sensitivity of 0.107 mV/% RH; and again linear from 3.250 mV to 30.580 mV as the humidity level increases from 60% RH to 95% RH, with higher sensitivity of 0.781 mV/% RH. On the other hand, the sensitivity of the humidity sensor increases linearly from 0.102 mV/% RH to 0.501 mV/% RH with increase in the temperature from 40 °C to 80 °C and a maximum hysteresis of 0.87% RH is found at a relative humidity of 80%. The sensitivity is also frequency dependent, increasing from 0.500 mV/% RH at 2 Hz to reach a maximum value of 1.634 mV/% RH at a frequency of 12 Hz, then decreasing to 1.110 mV/% RH at a frequency of 20 Hz. Finally, the CMOS-MEMS humidity sensor showed comparable response, recovery, and repeatability of measurements in three cycles as compared to a standard sensor that directly

  16. The DUV Stability of Superlattice-Doped CMOS Detector Arrays

    NASA Technical Reports Server (NTRS)

    Hoenk, M. E.; Carver, A. G.; Jones, T.; Dickie, M.; Cheng, P.; Greer, H. F.; Nikzad, S.; Sgro, J.; Tsur, S.

    2013-01-01

    JPL and Alacron have recently developed a high performance, DUV camera with a superlattice doped CMOS imaging detector. Supperlattice doped detectors achieve nearly 100% internal quantum efficiency in the deep and far ultraviolet, and a single layer, Al2O3 antireflection coating enables 64% external quantum efficiency at 263nm. In lifetime tests performed at Applied Materials using 263 nm pulsed, solid state and 193 nm pulsed excimer laser, the quantum efficiency and dark current of the JPL/Alacron camera remained stable to better than 1% precision during long-term exposure to several billion laser pulses, with no measurable degradation, no blooming and no image memory at 1000 fps.

  17. Design and experimental verification of low-voltage two-dimensional CMOS electrophoresis platform with 32 × 32 sample/hold cell array

    NASA Astrophysics Data System (ADS)

    Yamaji, Yuuki; Niitsu, Kiichi; Nakazato, Kazuo

    2016-03-01

    Electrophoresis is widely used in biomedical applications. However, conventional (centimeter-order) electrophoresis requires a high-voltage power supply, which is not suitable for point-of-care testing (POCT). Electrophoresis is driven by electric fields, and miniaturization (from the centimeter order to the micrometer order) is effective for low-voltage operation. A CMOS platform is a cost-competitive and promising candidate for miniaturization and enables the integration of biomolecule manipulation by electrophoresis and its electrochemical sensing. These features will contribute to the development of a biochemical analyzer called the micro-total analysis system (µ-TAS). To realize a truly portable electrophoresis system, we present the design and experimental verification of a low-voltage (<1 V), two-dimensional CMOS electrophoresis platform with 32 × 32 sample/hold cell array. Experimental results showed successful constant voltage outputs to each electrode. By miniaturizing the electrode structure to a 60 µm pitch, we achieved sufficient electric field strength even at low voltages.

  18. Hardening CMOS imagers: radhard-by-design or radhard-by-foundry

    NASA Astrophysics Data System (ADS)

    Pain, Bedabrata; Hancock, Bruce R.; Cunningham, Thomas J.; Seshadri, Suresh; Sun, Chao; Pedadda, Pavani; Wrigley, Christopher J.; Stirbl, Robert C.

    2004-01-01

    A comparative study between radhard-by-design and radhard-by-foundry approaches for radiation hardening of CMOS imagers is presented. Main mechanisms for performance degradation in CMOS imagers in a radiation environment are identified, and key differences between the radiation effects in CMOS imagers and that in digital logic circuits are explained. Design methodologies for implementation of CMOS imagers operating in a radiation environment are presented. By summarizing the performance results obtained from imagers implemented in both radhard-by-design and radhard-by-foundry approaches, the advantages and shortcomings of both approaches are identified. It is shown that neither approach presents an optimum solution. The paper concludes by discussing an alternate pathway to overcome these limitations and enable the next-generation high-performance radiation-hard CMOS imagers.

  19. Optimum Design of CMOS DC-DC Converter for Mobile Applications

    NASA Astrophysics Data System (ADS)

    Katayama, Yasushi; Edo, Masaharu; Denta, Toshio; Kawashima, Tetsuya; Ninomiya, Tamotsu

    In recent years, low output power CMOS DC-DC converters which integrate power stage MOSFETs and a PWM controller using CMOS process have been used in many mobile applications. In this paper, we propose the calculation method of CMOS DC-DC converter efficiency and report optimum design of CMOS DC-DC converter based on this method. By this method, converter efficiencies are directly calculated from converter specifications, dimensions of power stage MOSFET and device parameters. Therefore, this method can be used for optimization of CMOS DC-DC converter design, such as dimensions of power stage MOSFET and switching frequency. The efficiency calculated by the proposed method agrees well with the experimental results.

  20. Beyond CMOS: heterogeneous integration of III–V devices, RF MEMS and other dissimilar materials/devices with Si CMOS to create intelligent microsystems

    PubMed Central

    Kazior, Thomas E.

    2014-01-01

    Advances in silicon technology continue to revolutionize micro-/nano-electronics. However, Si cannot do everything, and devices/components based on other materials systems are required. What is the best way to integrate these dissimilar materials and to enhance the capabilities of Si, thereby continuing the micro-/nano-electronics revolution? In this paper, I review different approaches to heterogeneously integrate dissimilar materials with Si complementary metal oxide semiconductor (CMOS) technology. In particular, I summarize results on the successful integration of III–V electronic devices (InP heterojunction bipolar transistors (HBTs) and GaN high-electron-mobility transistors (HEMTs)) with Si CMOS on a common silicon-based wafer using an integration/fabrication process similar to a SiGe BiCMOS process (BiCMOS integrates bipolar junction and CMOS transistors). Our III–V BiCMOS process has been scaled to 200 mm diameter wafers for integration with scaled CMOS and used to fabricate radio-frequency (RF) and mixed signals circuits with on-chip digital control/calibration. I also show that RF microelectromechanical systems (MEMS) can be integrated onto this platform to create tunable or reconfigurable circuits. Thus, heterogeneous integration of III–V devices, MEMS and other dissimilar materials with Si CMOS enables a new class of high-performance integrated circuits that enhance the capabilities of existing systems, enable new circuit architectures and facilitate the continued proliferation of low-cost micro-/nano-electronics for a wide range of applications. PMID:24567473

  1. Beyond CMOS: heterogeneous integration of III-V devices, RF MEMS and other dissimilar materials/devices with Si CMOS to create intelligent microsystems.

    PubMed

    Kazior, Thomas E

    2014-03-28

    Advances in silicon technology continue to revolutionize micro-/nano-electronics. However, Si cannot do everything, and devices/components based on other materials systems are required. What is the best way to integrate these dissimilar materials and to enhance the capabilities of Si, thereby continuing the micro-/nano-electronics revolution? In this paper, I review different approaches to heterogeneously integrate dissimilar materials with Si complementary metal oxide semiconductor (CMOS) technology. In particular, I summarize results on the successful integration of III-V electronic devices (InP heterojunction bipolar transistors (HBTs) and GaN high-electron-mobility transistors (HEMTs)) with Si CMOS on a common silicon-based wafer using an integration/fabrication process similar to a SiGe BiCMOS process (BiCMOS integrates bipolar junction and CMOS transistors). Our III-V BiCMOS process has been scaled to 200 mm diameter wafers for integration with scaled CMOS and used to fabricate radio-frequency (RF) and mixed signals circuits with on-chip digital control/calibration. I also show that RF microelectromechanical systems (MEMS) can be integrated onto this platform to create tunable or reconfigurable circuits. Thus, heterogeneous integration of III-V devices, MEMS and other dissimilar materials with Si CMOS enables a new class of high-performance integrated circuits that enhance the capabilities of existing systems, enable new circuit architectures and facilitate the continued proliferation of low-cost micro-/nano-electronics for a wide range of applications.

  2. Analysis and Design of a Linear Digital Programmable Gain Amplifier in a 0.13 µm SiGe BiCMOS technology

    NASA Astrophysics Data System (ADS)

    Du, Xuan-Quang; Knobloch, Anselm; Grözing, Markus; Buck, Matthias; Berroth, Manfred

    2017-03-01

    This paper presents the analysis and the design of a fully-differential digital programmable gain amplifier (PGA) in a 0.13 µm BiCMOS technology. The PGA has a gain control range of 31 dB with 1 dB gain step size and consumes 284 mW from a 3.6 V power supply. At a maximum gain of 25 dB, the PGA exhibits a 3-dB bandwidth of 10.1 GHz. The measured gain error for all 32 possible gain settings is between -0.19/+0.46 dB at 1 GHz. Up to 13 GHz the third harmonic distortion H{D3} stays below -34 dB for all 32 gain settings at a differential output peak-to-peak voltage of 1 V after the last amplifier stage.

  3. An electrostatic CMOS/BiCMOS Lithium ion vibration-based harvester-charger IC

    NASA Astrophysics Data System (ADS)

    Torres, Erick Omar

    Self-powered microsystems, such as wireless transceiver microsensors, appeal to an expanding application space in monitoring, control, and diagnosis for commercial, industrial, military, space, and biomedical products. As these devices continue to shrink, their microscale dimensions allow them to be unobtrusive and economical, with the potential to operate from typically unreachable environments and, in wireless network applications, deploy numerous distributed sensing nodes simultaneously. Extended operational life, however, is difficult to achieve since their limited volume space constrains the stored energy available, even with state-of-the-art technologies, such as thin-film lithium-ion batteries (Li Ion) and micro-fuel cells. Harvesting ambient energy overcomes this deficit by continually replenishing the energy reservoir and, as a result, indefinitely extending system lifetime. In this work, an electrostatic harvester that harnesses ambient kinetic energy from vibrations to charge an energy-storage device (e.g., a battery) is investigated, developed, and evaluated. The proposed harvester charges and holds the voltage across a vibration-sensitive variable capacitor so that vibrations can induce it to generate current into the battery when capacitance decreases (as its plates separate). The challenge is that energy is harnessed at relatively slow rates, producing low output power, and the electronics required to transfer it to charge a battery can easily demand more than the power produced. To this end, the system reduces losses by time-managing and biasing its circuits to operate only when needed and with just enough energy while charging the capacitor through an efficient quasi-lossless inductor-based precharger. As result, the proposed energy harvester stores a net energy gain in the battery during every vibration cycle. Two energy-harvesting integrated circuits (IC) were analyzed, designed, developed, and validated using a 0.7-im BiCMOS process and a 30-Hz

  4. 76 FR 20835 - Amendment of VOR Federal Airways V-1, V-7, V-11 and V-20; Kona, HI

    Federal Register 2010, 2011, 2012, 2013, 2014

    2011-04-14

    ... Administration 14 CFR Part 71 Amendment of VOR Federal Airways V-1, V-7, V-11 and V-20; Kona, HI AGENCY: Federal... delays the effective date for the amendment of four VOR Federal airways in the vicinity of Kona, HI; V-1...), amends VOR Federal Airways V-1, V-7 V-11 and V-20; Kona, HI. These VHF Omnidirectional Range Federal...

  5. Design considerations for a new high resolution Micro-Angiographic Fluoroscope based on a CMOS sensor (MAF-CMOS)

    NASA Astrophysics Data System (ADS)

    Loughran, Brendan; Swetadri Vasan, S. N.; Singh, Vivek; Ionita, Ciprian N.; Jain, Amit; Bednarek, Daniel R.; Titus, Albert H.; Rudin, Stephen

    2013-03-01

    The detectors that are used for endovascular image-guided interventions (EIGI), particularly for neurovascular interventions, do not provide clinicians with adequate visualization to ensure the best possible treatment outcomes. Developing an improved x-ray imaging detector requires the determination of estimated clinical x-ray entrance exposures to the detector. The range of exposures to the detector in clinical studies was found for the three modes of operation: fluoroscopic mode, high frame-rate digital angiographic mode (HD fluoroscopic mode), and DSA mode. Using these estimated detector exposure ranges and available CMOS detector technical specifications, design requirements were developed to pursue a quantum limited, high resolution, dynamic x-ray detector based on a CMOS sensor with 50 μm pixel size. For the proposed MAF-CMOS, the estimated charge collected within the full exposure range was found to be within the estimated full well capacity of the pixels. Expected instrumentation noise for the proposed detector was estimated to be 50-1,300 electrons. Adding a gain stage such as a light image intensifier would minimize the effect of the estimated instrumentation noise on total image noise but may not be necessary to ensure quantum limited detector operation at low exposure levels. A recursive temporal filter may decrease the effective total noise by 2 to 3 times, allowing for the improved signal to noise ratios at the lowest estimated exposures despite consequent loss in temporal resolution. This work can serve as a guide for further development of dynamic x-ray imaging prototypes or improvements for existing dynamic x-ray imaging systems.

  6. Design considerations for a new, high resolution Micro-Angiographic Fluoroscope based on a CMOS sensor (MAF-CMOS).

    PubMed

    Loughran, Brendan; Swetadri Vasan, S N; Singh, Vivek; Ionita, Ciprian N; Jain, Amit; Bednarek, Daniel R; Titus, Albert; Rudin, Stephen

    2013-03-06

    The detectors that are used for endovascular image-guided interventions (EIGI), particularly for neurovascular interventions, do not provide clinicians with adequate visualization to ensure the best possible treatment outcomes. Developing an improved x-ray imaging detector requires the determination of estimated clinical x-ray entrance exposures to the detector. The range of exposures to the detector in clinical studies was found for the three modes of operation: fluoroscopic mode, high frame-rate digital angiographic mode (HD fluoroscopic mode), and DSA mode. Using these estimated detector exposure ranges and available CMOS detector technical specifications, design requirements were developed to pursue a quantum limited, high resolution, dynamic x-ray detector based on a CMOS sensor with 50 μm pixel size. For the proposed MAF-CMOS, the estimated charge collected within the full exposure range was found to be within the estimated full well capacity of the pixels. Expected instrumentation noise for the proposed detector was estimated to be 50-1,300 electrons. Adding a gain stage such as a light image intensifier would minimize the effect of the estimated instrumentation noise on total image noise but may not be necessary to ensure quantum limited detector operation at low exposure levels. A recursive temporal filter may decrease the effective total noise by 2 to 3 times, allowing for the improved signal to noise ratios at the lowest estimated exposures despite consequent loss in temporal resolution. This work can serve as a guide for further development of dynamic x-ray imaging prototypes or improvements for existing dynamic x-ray imaging systems.

  7. Robust Supersolidity in the V1- V2 Extended Bose-Hubbard Model

    NASA Astrophysics Data System (ADS)

    Greene, Nicole; Pixley, Jedediah

    2016-05-01

    Motivated by ultra-cold atomic gases with long-range interactions in an optical lattice we study the effects of the next-nearest neighbor interaction on the extended Bose-Hubbard model on a square lattice. Using the variational Gutzwiller approach with a four-site unit cell we determine the ground state phase diagrams as a function of the model parameters. We focus on the interplay of each interaction between the nearest neighbor (V1) , the next-nearest neighbor (V2) , and the onsite repulsion (U). We find various super-solid phases that can be described by one of the ordering wave-vectors (π, 0), (0, π) , and (π, π) . In the limits V1, V2 1, V2 >U we find phases reminiscent of the limit V2 = 0 but with a richer super solid structure. For V1

  8. Single phase dynamic CMOS PLA using charge sharing technique

    NASA Astrophysics Data System (ADS)

    Dhong, Y. B.; Tsang, C. P.

    A single phase dynamic CMOS NOR-NOR programmable logic array (PLA) using triggered decoders and charge sharing techniques for high speed and low power is presented. By using the triggered decoder technique, the ground switches are eliminated, thereby, making this new design much faster and lower power dissipation than conventional PLA's. By using the charge-sharing technique in a dynamic CMOS NOR structure, a cascading AND gate can be implemented. The proposed PLA's are presented with a delay-time of 15.95 and 18.05 nsec, respectively, which compare with a conventional single phase PLA with 35.5 nsec delay-time. For a typical example of PLA like the Signetics 82S100 with 16 inputs, 48 input minterms (m) and 8 output minterms (n), the 2-SOP PLA using the triggered 2-bit decoder is 2.23 times faster and has 2.1 times less power dissipation than the conventional PLA. These results are simulated using maximum drain current of 600 micro-A, gate length of 2.0 micron, V sub DD of 5 V, the capacitance of an input miniterm of 1600 fF, and the capacitance of an output minterm of 1500 fF.

  9. Macromolecular crystallography with a large format CMOS detector

    SciTech Connect

    Nix, Jay C.

    2016-07-27

    Recent advances in CMOS technology have allowed the production of large surface area detectors suitable for macromolecular crystallography experiments [1]. The Molecular Biology Consortium (MBC) Beamline 4.2.2 at the Advanced Light Source in Berkeley, CA, has installed a 2952 x 2820 mm RDI CMOS-8M detector with funds from NIH grant S10OD012073. The detector has a 20nsec dead pixel time and performs well with shutterless data collection strategies. The sensor obtains sharp point response and minimal optical distortion by use of a thin fiber-optic plate between the phosphor and sensor module. Shutterless data collections produce high-quality redundant datasets that can be obtained in minutes. The fine-sliced data are suitable for processing in standard crystallographic software packages (XDS, HKL2000, D*TREK, MOSFLM). Faster collection times relative to the previous CCD detector have resulted in a record number of datasets collected in a calendar year and de novo phasing experiments have resulted in publications in both Science and Nature [2,3]. The faster collections are due to a combination of the decreased overhead requirements of shutterless collections combined with exposure times that have decreased by over a factor of 2 for images with comparable signal to noise of the NOIR-1 detector. The overall increased productivity has allowed the development of new beamline capabilities and data collection strategies.

  10. CMOS prototype for retinal prosthesis applications with analog processing

    NASA Astrophysics Data System (ADS)

    Castillo-Cabrera, G.; García-Lamont, J.; Reyes-Barranca, M. A.; Matsumoto-Kuwabara, Y.; Moreno-Cadenas, J. A.; Flores-Nava, L. M.

    2014-12-01

    A core architecture for analog processing, which emulates a retina's receptive field, is presented in this work. A model was partially implemented and built on CMOS standard technology through MOSIS. It considers that the receptive field is the basic unit for image processing in the visual system. That is why the design is concerned on a partial solution of receptive field properties in order to be adapted in the future as an aid to people with retinal diseases. A receptive field is represented by an array of 3×3 pixels. Each pixel carries out a process based on four main operations. This means that image processing is developed at pixel level. Operations involved are: (1) photo-transduction by photocurrent integration, (2) signal averaging from eight neighbouring pixels executed by a neu-NMOS (ν-NMOS) neuron, (3) signal average gradient between central pixel and the average value from the eight neighbouring pixels (this gradient is performed by a comparator) and finally (4) a pulse generator. Each one of these operations gives place to circuital blocks which were built on 0.5 μm CMOS technology.

  11. Fabrication and Characterization of CMOS-MEMS Magnetic Microsensors

    PubMed Central

    Hsieh, Chen-Hsuan; Dai, Ching-Liang; Yang, Ming-Zhi

    2013-01-01

    This study investigates the design and fabrication of magnetic microsensors using the commercial 0.35 μm complementary metal oxide semiconductor (CMOS) process. The magnetic sensor is composed of springs and interdigitated electrodes, and it is actuated by the Lorentz force. The finite element method (FEM) software CoventorWare is adopted to simulate the displacement and capacitance of the magnetic sensor. A post-CMOS process is utilized to release the suspended structure. The post-process uses an anisotropic dry etching to etch the silicon dioxide layer and an isotropic dry etching to remove the silicon substrate. When a magnetic field is applied to the magnetic sensor, it generates a change in capacitance. A sensing circuit is employed to convert the capacitance variation of the sensor into the output voltage. The experimental results show that the output voltage of the magnetic microsensor varies from 0.05 to 1.94 V in the magnetic field range of 5–200 mT. PMID:24172287

  12. Development of a multi-sensor CMOS ASIC

    NASA Astrophysics Data System (ADS)

    van der Merwe, D. G.

    2016-02-01

    A multi-sensor application specific integrated circuit has been developed with a number of sensors: capacitive, inductive, magnetic, ambient light, infrared and acceleration. The capacitive sensing is implemented using a unique, patented, charge transfer technique allowing the measurement of very small capacitances while at the same time eliminating the effects of unwanted parasitic capacitances in the measurement circuit. For cost effective implementation the charge transfer measurement circuit has been has been modified, augmented and expanded to not only measure capacitance but also to act as the measurement circuit for all the sensors. Enabling the multi-sensor chip to measure acceleration on a range of MEMs accelerometer chips including a single axis accelerometer, a dual axis xy accelerometer and a z-axis accelerometer, innovative and patent pending techniques have been developed and implemented on standard CMOS. The CMOS ASIC and a MEMs chip will be double bonded in a plastic package offering multi-sensor capability in a small low cost package.

  13. Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique.

    PubMed

    Kao, Pin-Hsu; Dai, Ching-Liang; Hsu, Cheng-Chih; Wu, Chyan-Chyi

    2009-01-01

    In this study we used the commercial 0.35 μm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS (microelectromechanical system) motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55° when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz.

  14. W-CMOS blanking device for projection multibeam lithography

    NASA Astrophysics Data System (ADS)

    Jurisch, Michael; Irmscher, Mathias; Letzkus, Florian; Eder-Kapl, Stefan; Klein, Christof; Loeschner, Hans; Piller, Walter; Platzgummer, Elmar

    2010-05-01

    As the designs of future mask nodes become more and more complex the corresponding pattern writing times will rise significantly when using single beam writing tools. Projection multi-beam lithography [1] is one promising technology to enhance the throughput compared to state of the art VSB pattern generators. One key component of the projection multi-beam tool is an Aperture Plate System (APS) to form and switch thousands of individual beamlets. In our present setup a highly parallel beam is divided into 43,008 individual beamlets by a Siaperture- plate. These micrometer sized beams pass through larger openings in a blanking-plate and are individually switched on and off by applying a voltage to blanking-electrodes which are placed around the blanking-plate openings. A charged particle 200x reduction optics demagnifies the beamlet array to the substrate. The switched off beams are filtered out in the projection optics so that only the beams which are unaffected by the blanking-plate are projected to the substrate with 200x reduction. The blanking-plate is basically a CMOS device for handling the writing data. In our work the blanking-electrodes are fabricated using CMOS compatible add on processes like SiO2-etching or metal deposition and structuring. A new approach is the implementation of buried tungsten electrodes for beam blanking.

  15. Single phase dynamic CMOS PLA using charge sharing technique

    NASA Technical Reports Server (NTRS)

    Dhong, Y. B.; Tsang, C. P.

    1991-01-01

    A single phase dynamic CMOS NOR-NOR programmable logic array (PLA) using triggered decoders and charge sharing techniques for high speed and low power is presented. By using the triggered decoder technique, the ground switches are eliminated, thereby, making this new design much faster and lower power dissipation than conventional PLA's. By using the charge-sharing technique in a dynamic CMOS NOR structure, a cascading AND gate can be implemented. The proposed PLA's are presented with a delay-time of 15.95 and 18.05 nsec, respectively, which compare with a conventional single phase PLA with 35.5 nsec delay-time. For a typical example of PLA like the Signetics 82S100 with 16 inputs, 48 input minterms (m) and 8 output minterms (n), the 2-SOP PLA using the triggered 2-bit decoder is 2.23 times faster and has 2.1 times less power dissipation than the conventional PLA. These results are simulated using maximum drain current of 600 micro-A, gate length of 2.0 micron, V sub DD of 5 V, the capacitance of an input miniterm of 1600 fF, and the capacitance of an output minterm of 1500 fF.

  16. Si light-emitting device in integrated photonic CMOS ICs

    NASA Astrophysics Data System (ADS)

    Xu, Kaikai; Snyman, Lukas W.; Aharoni, Herzl

    2017-07-01

    The motivation for integrated Si optoelectronics is the creation of low-cost photonics for mass-market applications. Especially, the growing demand for sensitive biochemical sensors in the environmental control or medicine leads to the development of integrated high resolution sensors. Here CMOS-compatible Si light-emitting device structures are presented for investigating the effect of various depletion layer profiles and defect engineering on the photonic transition in the 1.4-2.8 eV. A novel Si device is proposed to realize both a two-terminal Si-diode light-emitting device and a three-terminal Si gate-controlled diode light-emitting device in the same device structure. In addition to the spectral analysis, differences between two-terminal and three-terminal devices are discussed, showing the light emission efficiency change. The proposed Si optical source may find potential applications in micro-photonic systems and micro-optoelectro-mechanical systems (MOEMS) in CMOS integrated circuitry.

  17. IR CMOS: near infrared enhanced digital imaging (Presentation Recording)

    NASA Astrophysics Data System (ADS)

    Pralle, Martin U.; Carey, James E.; Joy, Thomas; Vineis, Chris J.; Palsule, Chintamani

    2015-08-01

    SiOnyx has demonstrated imaging at light levels below 1 mLux (moonless starlight) at video frame rates with a 720P CMOS image sensor in a compact, low latency camera. Low light imaging is enabled by the combination of enhanced quantum efficiency in the near infrared together with state of the art low noise image sensor design. The quantum efficiency enhancements are achieved by applying Black Silicon, SiOnyx's proprietary ultrafast laser semiconductor processing technology. In the near infrared, silicon's native indirect bandgap results in low absorption coefficients and long absorption lengths. The Black Silicon nanostructured layer fundamentally disrupts this paradigm by enhancing the absorption of light within a thin pixel layer making 5 microns of silicon equivalent to over 300 microns of standard silicon. This results in a demonstrate 10 fold improvements in near infrared sensitivity over incumbent imaging technology while maintaining complete compatibility with standard CMOS image sensor process flows. Applications include surveillance, nightvision, and 1064nm laser see spot. Imaging performance metrics will be discussed. Demonstrated performance characteristics: Pixel size : 5.6 and 10 um Array size: 720P/1.3Mpix Frame rate: 60 Hz Read noise: 2 ele/pixel Spectral sensitivity: 400 to 1200 nm (with 10x QE at 1064nm) Daytime imaging: color (Bayer pattern) Nighttime imaging: moonless starlight conditions 1064nm laser imaging: daytime imaging out to 2Km

  18. Custom CMOS Reed Solomon coder for the Hubble Space Telescope

    NASA Technical Reports Server (NTRS)

    Whitaker, S.; Cameron, K.; Owsley, P.; Maki, G.

    1990-01-01

    A VLSI coder is presented that can function either as an encoder or decoder for Reed-Solomon codes. VLSI is one approach to implementing high-performance Reed-Solomon decoders. There are three VLSI technologies that could be used: gate arrays, standard cells, and full custom. The first two approaches are relatively easy to implement, but are limited in both performance and density. Full-custom VLSI is used to achieve both circuit density and speed, and allows control of the amount of interconnect. Speed, which is a function of capacitance, which is a function of interconnect, is an important parameter in high-performance VLSI. A single 8.2 mm x 8.4 mm, 200,000 transistor CMOS chip implementation of the Reed-Solomon code required by the Hubble Space Telescope is reported. The chip features a 10-MHz sustained byte rate independent of error pattern. The 1.6-micron CMOS integrated circuit has complete decoder and encoder functions and uses a single data/system clock. Block lengths up to 255 bytes and shortened codes are supported with no external buffering. Erasure corrections and random error corrections are supported with programmable correction of up to 10 symbol errors. Correction time is independent of error pattern and the number of errors in the incoming message.

  19. Illumination robust change detection with CMOS imaging sensors

    NASA Astrophysics Data System (ADS)

    Rengarajan, Vijay; Gupta, Sheetal B.; Rajagopalan, A. N.; Seetharaman, Guna

    2015-05-01

    Change detection between two images in the presence of degradations is an important problem in the computer vision community, more so for the aerial scenario which is particularly challenging. Cameras mounted on moving platforms such as aircrafts or drones are subject to general six-dimensional motion as the motion is not restricted to a single plane. With CMOS cameras increasingly in vogue due to their low power consumption, the inevitability of rolling-shutter (RS) effect adds to the challenge. This is caused by sequential exposure of rows in CMOS cameras unlike conventional global shutter cameras where all pixels are exposed simultaneously. The RS effect is particularly pronounced in aerial imaging since each row of the imaging sensor is likely to experience a different motion. For fast-moving platforms, the problem is further compounded since the rows are also affected by motion blur. Moreover, since the two images are shot at different times, illumination differences are common. In this paper, we propose a unified computational framework that elegantly exploits the scarcity constraint to deal with the problem of change detection in images degraded by RS effect, motion blur as well as non-global illumination differences. We formulate an optimization problem where each row of the distorted image is approximated as a weighted sum of the corresponding rows in warped versions of the reference image due to camera motion within the exposure period to account for geometric as well as photometric differences. The method has been validated on both synthetic and real data.

  20. CMOS: efficient clustered data monitoring in sensor networks.

    PubMed

    Min, Jun-Ki

    2013-01-01

    Tiny and smart sensors enable applications that access a network of hundreds or thousands of sensors. Thus, recently, many researchers have paid attention to wireless sensor networks (WSNs). The limitation of energy is critical since most sensors are battery-powered and it is very difficult to replace batteries in cases that sensor networks are utilized outdoors. Data transmission between sensor nodes needs more energy than computation in a sensor node. In order to reduce the energy consumption of sensors, we present an approximate data gathering technique, called CMOS, based on the Kalman filter. The goal of CMOS is to efficiently obtain the sensor readings within a certain error bound. In our approach, spatially close sensors are grouped as a cluster. Since a cluster header generates approximate readings of member nodes, a user query can be answered efficiently using the cluster headers. In addition, we suggest an energy efficient clustering method to distribute the energy consumption of cluster headers. Our simulation results with synthetic data demonstrate the efficiency and accuracy of our proposed technique.

  1. Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique

    PubMed Central

    Kao, Pin-Hsu; Dai, Ching-Liang; Hsu, Cheng-Chih; Wu, Chyan-Chyi

    2009-01-01

    In this study we used the commercial 0.35 μm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS (microelectromechanical system) motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55° when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz. PMID:22454581

  2. Review of radiation damage studies on DNW CMOS MAPS

    NASA Astrophysics Data System (ADS)

    Traversi, G.; Gaioni, L.; Manazza, A.; Manghisoni, M.; Ratti, L.; Re, V.; Zucca, S.; Bettarini, S.; Rizzo, G.; Morsani, F.; Bosisio, L.; Rashevskaya, I.; Cindro, V.

    2013-12-01

    Monolithic active pixel sensors fabricated in a bulk CMOS technology with no epitaxial layer and standard resistivity (10 Ω cm) substrate, featuring a deep N-well as the collecting electrode (DNW MAPS), have been exposed to γ-rays, up to a final dose of 10 Mrad (SiO2), and to neutrons from a nuclear reactor, up to a total 1 MeV neutron equivalent fluence of about 3.7 ·1013cm-2. The irradiation campaign was aimed at studying the effects of radiation on the most significant parameters of the front-end electronics and on the charge collection properties of the sensors. Device characterization has been carried out before and after irradiations. The DNW MAPS irradiated with 60Co γ-rays were also subjected to high temperature annealing (100 °C for 168 h). Measurements have been performed through a number of different techniques, including electrical characterization of the front-end electronics and of DNW diodes, laser stimulation of the sensors and tests with 55Fe and 90Sr radioactive sources. This paper reviews the measurement results, their relation with the damage mechanisms underlying performance degradation and provides a new comparison between DNW devices and MAPS fabricated in a CMOS process with high resistivity (1 kΩ cm) epitaxial layer.

  3. A Low-Cost CMOS Programmable Temperature Switch.

    PubMed

    Li, Yunlong; Wu, Nanjian

    2008-05-15

    A novel uncalibrated CMOS programmable temperature switch with high temperature accuracy is presented. Its threshold temperature Tth can be programmed by adjusting the ratios of width and length of the transistors. The operating principles of the temperature switch circuit is theoretically explained. A floating gate neural MOS circuit is designed to compensate automatically the threshold temperature Tth variation that results form the process tolerance. The switch circuit is implemented in a standard 0.35 μm CMOS process. The temperature switch can be programmed to perform the switch operation at 16 different threshold temperature Tths from 45-120°C with a 5°C increment. The measurement shows a good consistency in the threshold temperatures. The chip core area is 0.04 mm² and power consumption is 3.1 μA at 3.3V power supply. The advantages of the temperature switch are low power consumption, the programmable threshold temperature and the controllable hysteresis.

  4. High-stage analog accumulator for TDI CMOS image sensors

    NASA Astrophysics Data System (ADS)

    Jianxin, Li; Fujun, Huang; Yong, Zong; Jing, Gao

    2016-02-01

    The impact of the parasitic phenomenon on the performance of the analog accumulator in TDI CMOS image sensor is analyzed and resolved. A 128-stage optimized accumulator based on 0.18-μm one-poly four-metal 3.3 V CMOS technology is designed and simulated. A charge injection effect from the top plate sampling is employed to compensate the un-eliminated parasitics based on the accumulator with a decoupling switch, and then a calibration circuit is designed to restrain the mismatch and Process, Voltage and Temperature (PVT) variations. The post layout simulation indicates that the improved SNR of the accumulator upgrades from 17.835 to 21.067 dB, while an ideal value is 21.072 dB. In addition, the linearity of the accumulator is 99.62%. The simulation results of two extreme cases and Monte Carlo show that the mismatch and PVT variations are restrained by the calibration circuit. Furthermore, it is promising to design a higher stage accumulator based on the proposed structure. Project supported by the National Natural Science Foundation of China (Nos. 61404090, 61434004).

  5. Improvement to the signaling interface for CMOS pixel sensors

    NASA Astrophysics Data System (ADS)

    Shi, Zhan; Tang, Zhenan; Feng, Chong; Cai, Hong

    2016-10-01

    The development of the readout speed of CMOS pixel sensors (CPS) is motivated by the demanding requirements of future high energy physics (HEP) experiments. As the interface between CPS and the data acquisition (DAQ) system, which inputs clock from the DAQ system and outputs data from CPS, the signaling interface should also be improved in terms of data rates. Meanwhile, the power consumption of the signaling interface should be maintained as low as possible. Consequently, a reduced swing differential signaling (RSDS) driver was adopted instead of a low-voltage differential signaling (LVDS) driver to transmit data from CPS to the DAQ system. In order to increase the capability of data rates, a serial source termination technique was employed. A LVDS/RSDS receiver was employed for transmitting clock from the DAQ system to CPS. A new method of generating hysteresis and a special current comparator were used to achieve a higher speed with lower power consumption. The signaling interface was designed and submitted for fabrication in a 0.18 μm CMOS image sensor (CIS) process. Measurement results indicate that the RSDS driver and the LVDS receiver can operate correctly at a data rate of 2 Gb/s with a power consumption of 19.1 mW.

  6. HV-CMOS detectors in BCD8 technology

    NASA Astrophysics Data System (ADS)

    Andreazza, A.; Castoldi, A.; Ceriale, V.; Chiodini, G.; Citterio, M.; Darbo, G.; Gariano, G.; Gaudiello, A.; Guazzoni, C.; Joshi, A.; Liberali, V.; Passadore, S.; Ragusa, F.; Ruscino, E.; Sbarra, C.; Shrimali, H.; Sidoti, A.; Stabile, A.; Yadav, I.; Zaffaroni, E.

    2016-11-01

    This paper presents the first pixel detector realized using the BCD8 technology of STMicroelectronics. The BCD8 is a 160 nm process with bipolar, CMOS and DMOS devices; mainly targeted for an automotive application. The silicon particle detector is realized as a pixel sensor diode with a dimension of 250 × 50 μm2. To support the signal sensitivity of pixel diode, the circuit simulations have been performed with a substrate voltage of 50 V. The analog signal processing circuitry and the digital operation of the circuit is designed with the supply voltage of 1.8 V. Moreover, an analog processing part of the pixel detector circuit is confined in a unit pixel (diode sensor) to achieve 100 % fill factor. As a first phase of the design, an array of 8 pixels and 4 passive diodes have been designed and measured experimentally. The entire analog circuitry including passive diodes is implemented in a single chip. This chip has been tested experimentally with 70 V voltage capability, to evaluate its suitability. The sensor on a 125 Ωcm resistivity substrate has been characterized in the laboratory. The CMOS sensor realizes a depleted region of several tens of micrometer. The characterization shows a uniform breakdown at 70 V before irradiation and an approximate capacitance of 80 fF at 50 V of reverse bias voltage. The response to ionizing radiation is tested using radioactive sources and an X-ray tube.

  7. CMOS mm-wave transceivers for Gbps wireless communication

    NASA Astrophysics Data System (ADS)

    Baoyong, Chi; Zheng, Song; Lixue, Kuang; Haikun, Jia; Xiangyu, Meng; Zhihua, Wang

    2016-07-01

    The challenges in the design of CMOS millimeter-wave (mm-wave) transceiver for Gbps wireless communication are discussed. To support the Gbps data rate, the link bandwidth of the receiver/transmitter must be wide enough, which puts a lot of pressure on the mm-wave front-end as well as on the baseband circuit. This paper discusses the effects of the limited link bandwidth on the transceiver system performance and overviews the bandwidth expansion techniques for mm-wave amplifiers and IF programmable gain amplifier. Furthermore, dual-mode power amplifier (PA) and self-healing technique are introduced to improve the PA's average efficiency and to deal with the process, voltage, and temperature variation issue, respectively. Several fully-integrated CMOS mm-wave transceivers are also presented to give a short overview on the state-of-the-art mm-wave transceivers. Project supported in part by the National Natural Science Foundation of China (No. 61331003).

  8. A 50Mbit/Sec. CMOS Video Linestore System

    NASA Astrophysics Data System (ADS)

    Jeung, Yeun C.

    1988-10-01

    This paper reports the architecture, design and test results of a CMOS single chip programmable video linestore system which has 16-bit data words with 1024 bit depth. The delay is fully programmable from 9 to 1033 samples by a 10 bit binary control word. The large 16 bit data word width makes the chip useful for a wide variety of digital video signal processing applications such as DPCM coding, High-Definition TV, and Video scramblers/descramblers etc. For those applications, the conventional large fixed-length shift register or static RAM scheme is not very popular because of its lack of versatility, high power consumption, and required support circuitry. The very high throughput of 50Mbit/sec is made possible by a highly parallel, pipelined dynamic memory architecture implemented in a 2-um N-well CMOS technology. The basic cell of the programmable video linestore chip is an four transistor dynamic RAM element. This cell comprises the majority of the chip's real estate, consumes no static power, and gives good noise immunity to the simply designed sense amplifier. The chip design was done using Bellcore's version of the MULGA virtual grid symbolic layout system. The chip contains approximately 90,000 transistors in an area of 6.5 x 7.5 square mm and the I/Os are TTL compatible. The chip is packaged in a 68-pin leadless ceramic chip carrier package.

  9. BiCMOS-integrated photodiode exploiting drift enhancement

    NASA Astrophysics Data System (ADS)

    Swoboda, Robert; Schneider-Hornstein, Kerstin; Wille, Holger; Langguth, Gernot; Zimmermann, Horst

    2014-08-01

    A vertical pin photodiode with a thick intrinsic layer is integrated in a 0.5-μm BiCMOS process. The reverse bias of the photodiode can be increased far above the circuit supply voltage, enabling a high-drift velocity. Therefore, a highly efficient and very fast photodiode is achieved. Rise/fall times down to 94 ps/141 ps at a bias of 17 V were measured for a wavelength of 660 nm. The bandwidth was increased from 1.1 GHz at 3 V to 2.9 GHz at 17 V due to the drift enhancement. A quantum efficiency of 85% with a 660-nm light was verified. The technological measures to avoid negative effects on an NPN transistor due to the Kirk effect caused by the low-doped I-layer epitaxy are described. With a high-energy collector implant, the NPN transit frequency is held above 20 GHz. CMOS devices are unaffected. This photodiode is suitable for a wide variety of high-sensitivity optical sensor applications, for optical communications, for fiber-in-the-home applications, and for optical interconnects.

  10. A CMOS Smart Temperature and Humidity Sensor with Combined Readout

    PubMed Central

    Eder, Clemens; Valente, Virgilio; Donaldson, Nick; Demosthenous, Andreas

    2014-01-01

    A fully-integrated complementary metal-oxide semiconductor (CMOS) sensor for combined temperature and humidity measurements is presented. The main purpose of the device is to monitor the hermeticity of micro-packages for implanted integrated circuits and to ensure their safe operation by monitoring the operating temperature and humidity on-chip. The smart sensor has two modes of operation, in which either the temperature or humidity is converted into a digital code representing a frequency ratio between two oscillators. This ratio is determined by the ratios of the timing capacitances and bias currents in both oscillators. The reference oscillator is biased by a current whose temperature dependency is complementary to the proportional to absolute temperature (PTAT) current. For the temperature measurement, this results in an exceptional normalized sensitivity of about 0.77%/°C at the accepted expense of reduced linearity. The humidity sensor is a capacitor, whose value varies linearly with relative humidity (RH) with a normalized sensitivity of 0.055%/% RH. For comparison, two versions of the humidity sensor with an area of either 0.2 mm2 or 1.2 mm2 were fabricated in a commercial 0.18 μm CMOS process. The on-chip readout electronics operate from a 5 V power supply and consume a current of approximately 85 μA. PMID:25230305

  11. Single donor electronics and quantum functionalities with advanced CMOS technology

    NASA Astrophysics Data System (ADS)

    Jehl, Xavier; Niquet, Yann-Michel; Sanquer, Marc

    2016-03-01

    Recent progresses in quantum dots technology allow fundamental studies of single donors in various semiconductor nanostructures. For the prospect of applications figures of merits such as scalability, tunability, and operation at relatively large temperature are of prime importance. Beyond the case of actual dopant atoms in a host crystal, similar arguments hold for small enough quantum dots which behave as artificial atoms, for instance for single spin control and manipulation. In this context, this experimental review focuses on the silicon-on-insulator devices produced within microelectronics facilities with only very minor modifications to the current industrial CMOS process and tools. This is required for scalability and enabled by shallow trench or mesa isolation. It also paves the way for real integration with conventional circuits, as illustrated by a nanoscale device coupled to a CMOS circuit producing a radio-frequency drive on-chip. At the device level we emphasize the central role of electrostatics in etched silicon nanowire transistors, which allows to understand the characteristics in the full range from zero to room temperature.

  12. A CMOS Imager with Focal Plane Compression using Predictive Coding

    NASA Technical Reports Server (NTRS)

    Leon-Salas, Walter D.; Balkir, Sina; Sayood, Khalid; Schemm, Nathan; Hoffman, Michael W.

    2007-01-01

    This paper presents a CMOS image sensor with focal-plane compression. The design has a column-level architecture and it is based on predictive coding techniques for image decorrelation. The prediction operations are performed in the analog domain to avoid quantization noise and to decrease the area complexity of the circuit, The prediction residuals are quantized and encoded by a joint quantizer/coder circuit. To save area resources, the joint quantizerlcoder circuit exploits common circuitry between a single-slope analog-to-digital converter (ADC) and a Golomb-Rice entropy coder. This combination of ADC and encoder allows the integration of the entropy coder at the column level. A prototype chip was fabricated in a 0.35 pm CMOS process. The output of the chip is a compressed bit stream. The test chip occupies a silicon area of 2.60 mm x 5.96 mm which includes an 80 X 44 APS array. Tests of the fabricated chip demonstrate the validity of the design.

  13. A CMOS active pixel sensor for retinal stimulation

    NASA Astrophysics Data System (ADS)

    Prydderch, Mark L.; French, Marcus J.; Mathieson, Keith; Adams, Christopher; Gunning, Deborah; Laudanski, Jonathan; Morrison, James D.; Moodie, Alan R.; Sinclair, James

    2006-02-01

    Degenerative photoreceptor diseases, such as age-related macular degeneration and retinitis pigmentosa, are the most common causes of blindness in the western world. A potential cure is to use a microelectronic retinal prosthesis to provide electrical stimulation to the remaining healthy retinal cells. We describe a prototype CMOS Active Pixel Sensor capable of detecting a visual scene and translating it into a train of electrical pulses for stimulation of the retina. The sensor consists of a 10 x 10 array of 100 micron square pixels fabricated on a 0.35 micron CMOS process. Light incident upon each pixel is converted into output current pulse trains with a frequency related to the light intensity. These outputs are connected to a biocompatible microelectrode array for contact to the retinal cells. The flexible design allows experimentation with signal amplitudes and frequencies in order to determine the most appropriate stimulus for the retina. Neural processing in the retina can be studied by using the sensor in conjunction with a Field Programmable Gate Array (FPGA) programmed to behave as a neural network. The sensor has been integrated into a test system designed for studying retinal response. We present the most recent results obtained from this sensor.

  14. Differential CMOS Sub-Terahertz Detector with Subthreshold Amplifier

    PubMed Central

    Han, Seong-Tae; Baek, Donghyun

    2017-01-01

    We propose a differential-type complementary metal-oxide-semiconductor (CMOS) sub-terahertz (THz) detector with a subthreshold preamplifier. The proposed detector improves the voltage responsivity and effective signal-to-noise ratio (SNR) using the subthreshold preamplifier, which is located between the differential detector device and main amplifier. The overall noise of the detector for the THz imaging system is reduced by the preamplifier because it diminishes the noise contribution of the main amplifier. The subthreshold preamplifier is self-biased by the output DC voltage of the detector core and has a dummy structure that cancels the DC offsets generated by the preamplifier itself. The 200 GHz detector fabricated using 0.25 μm CMOS technology includes a low drop-out regulator, current reference blocks, and an integrated antenna. A voltage responsivity of 2020 kV/W and noise equivalent power of 76 pW/√Hz are achieved using the detector at a gate bias of 0.5 V, respectively. The effective SNR at a 103 Hz chopping frequency is 70.9 dB with a 0.7 W/m2 input signal power density. The dynamic range of the raster-scanned THz image is 44.59 dB. PMID:28891927

  15. Miniaturized FDDA and CMOS Based Potentiostat for Bio-Applications

    PubMed Central

    Ghodsevali, Elnaz; Morneau-Gamache, Samuel; Mathault, Jessy; Landari, Hamza; Boisselier, Élodie; Boukadoum, Mounir; Gosselin, Benoit; Miled, Amine

    2017-01-01

    A novel fully differential difference CMOS potentiostat suitable for neurotransmitter sensing is presented. The described architecture relies on a fully differential difference amplifier (FDDA) circuit to detect a wide range of reduction-oxidation currents, while exhibiting low-power consumption and low-noise operation. This is made possible thanks to the fully differential feature of the FDDA, which allows to increase the source voltage swing without the need for additional dedicated circuitry. The FDDA also reduces the number of amplifiers and passive elements in the potentiostat design, which lowers the overall power consumption and noise. The proposed potentiostat was fabricated in 0.18 µm CMOS, with 1.8 V supply voltage. The device achieved 5 µA sensitivity and 0.99 linearity. The input-referred noise was 6.9 µVrms and the flicker noise was negligible. The total power consumption was under 55 µW. The complete system was assembled on a 20 mm × 20 mm platform that includes the potentiostat chip, the electrode terminals and an instrumentation amplifier for redox current buffering, once converted to a voltage by a series resistor. the chip dimensions were 1 mm × 0.5 mm and the other PCB components were off-chip resistors, capacitors and amplifiers for data acquisition. The system was successfully tested with ferricyanide, a stable electroactive compound, and validated with dopamine, a popular neurotransmitter. PMID:28394289

  16. A CMOS smart temperature and humidity sensor with combined readout.

    PubMed

    Eder, Clemens; Valente, Virgilio; Donaldson, Nick; Demosthenous, Andreas

    2014-09-16

    A fully-integrated complementary metal-oxide semiconductor (CMOS) sensor for combined temperature and humidity measurements is presented. The main purpose of the device is to monitor the hermeticity of micro-packages for implanted integrated circuits and to ensure their safe operation by monitoring the operating temperature and humidity on-chip. The smart sensor has two modes of operation, in which either the temperature or humidity is converted into a digital code representing a frequency ratio between two oscillators. This ratio is determined by the ratios of the timing capacitances and bias currents in both oscillators. The reference oscillator is biased by a current whose temperature dependency is complementary to the proportional to absolute temperature (PTAT) current. For the temperature measurement, this results in an exceptional normalized sensitivity of about 0.77%/°C at the accepted expense of reduced linearity. The humidity sensor is a capacitor, whose value varies linearly with relative humidity (RH) with a normalized sensitivity of 0.055%/% RH. For comparison, two versions of the humidity sensor with an area of either 0.2 mm2 or 1.2 mm2 were fabricated in a commercial 0.18 μm CMOS process. The on-chip readout electronics operate from a 5 V power supply and consume a current of approximately 85 µA.

  17. An integrated CMOS high data rate transceiver for video applications

    NASA Astrophysics Data System (ADS)

    Yaping, Liang; Dazhi, Che; Cheng, Liang; Lingling, Sun

    2012-07-01

    This paper presents a 5 GHz CMOS radio frequency (RF) transceiver built with 0.18 μm RF-CMOS technology by using a proprietary protocol, which combines the new IEEE 802.11n features such as multiple-in multiple-out (MIMO) technology with other wireless technologies to provide high data rate robust real-time high definition television (HDTV) distribution within a home environment. The RF frequencies cover from 4.9 to 5.9 GHz: the industrial, scientific and medical (ISM) band. Each RF channel bandwidth is 20 MHz. The transceiver utilizes a direct up transmitter and low-IF receiver architecture. A dual-quadrature direct up conversion mixer is used that achieves better than 35 dB image rejection without any on chip calibration. The measurement shows a 6 dB typical receiver noise figure and a better than 33 dB transmitter error vector magnitude (EVM) at -3 dBm output power.

  18. CMOS-TDI detector technology for reconnaissance application

    NASA Astrophysics Data System (ADS)

    Eckardt, Andreas; Reulke, Ralf; Jung, Melanie; Sengebusch, Karsten

    2014-10-01

    The Institute of Optical Sensor Systems (OS) at the Robotics and Mechatronics Center of the German Aerospace Center (DLR) has more than 30 years of experience with high-resolution imaging technology. This paper shows the institute's scientific results of the leading-edge detector design CMOS in a TDI (Time Delay and Integration) architecture. This project includes the technological design of future high or multi-spectral resolution spaceborne instruments and the possibility of higher integration. DLR OS and the Fraunhofer Institute for Microelectronic Circuits and Systems (IMS) in Duisburg were driving the technology of new detectors and the FPA design for future projects, new manufacturing accuracy and on-chip processing capability in order to keep pace with the ambitious scientific and user requirements. In combination with the engineering research, the current generation of space borne sensor systems is focusing on VIS/NIR high spectral resolution to meet the requirements on earth and planetary observation systems. The combination of large-swath and high-spectral resolution with intelligent synchronization control, fast-readout ADC (analog digital converter) chains and new focal-plane concepts opens the door to new remote-sensing and smart deep-space instruments. The paper gives an overview of the detector development status and verification program at DLR, as well as of new control possibilities for CMOS-TDI detectors in synchronization control mode.

  19. A CMOS Imager with Focal Plane Compression using Predictive Coding

    NASA Technical Reports Server (NTRS)

    Leon-Salas, Walter D.; Balkir, Sina; Sayood, Khalid; Schemm, Nathan; Hoffman, Michael W.

    2007-01-01

    This paper presents a CMOS image sensor with focal-plane compression. The design has a column-level architecture and it is based on predictive coding techniques for image decorrelation. The prediction operations are performed in the analog domain to avoid quantization noise and to decrease the area complexity of the circuit, The prediction residuals are quantized and encoded by a joint quantizer/coder circuit. To save area resources, the joint quantizerlcoder circuit exploits common circuitry between a single-slope analog-to-digital converter (ADC) and a Golomb-Rice entropy coder. This combination of ADC and encoder allows the integration of the entropy coder at the column level. A prototype chip was fabricated in a 0.35 pm CMOS process. The output of the chip is a compressed bit stream. The test chip occupies a silicon area of 2.60 mm x 5.96 mm which includes an 80 X 44 APS array. Tests of the fabricated chip demonstrate the validity of the design.

  20. Large CMOS imager using hadamard transform based multiplexing

    NASA Technical Reports Server (NTRS)

    Karasik, Boris S.; Wadsworth, Mark V.

    2005-01-01

    We have developed a concept design for a large (10k x 10k) CMOS imaging array whose elements are grouped in small subarrays with N pixels in each. The subarrays are code-division multiplexed using the Hadamard Transform (HT) based encoding. The Hadamard code improves the signal-to-noise (SNR) ratio to the reference of the read-out amplifier by a factor of N^1/2. This way of grouping pixels reduces the number of hybridization bumps by N. A single chip layout has been designed and the architecture of the imager has been developed to accommodate the HT base multiplexing into the existing CMOS technology. The imager architecture allows for a trade-off between the speed and the sensitivity. The envisioned imager would operate at a speed >100 fps with the pixel noise < 20 e-. The power dissipation would be 100 pW/pixe1. The combination of the large format, high speed, high sensitivity and low power dissipation can be very attractive for space reconnaissance applications.

  1. Single donor electronics and quantum functionalities with advanced CMOS technology.

    PubMed

    Jehl, Xavier; Niquet, Yann-Michel; Sanquer, Marc

    2016-03-16

    Recent progresses in quantum dots technology allow fundamental studies of single donors in various semiconductor nanostructures. For the prospect of applications figures of merits such as scalability, tunability, and operation at relatively large temperature are of prime importance. Beyond the case of actual dopant atoms in a host crystal, similar arguments hold for small enough quantum dots which behave as artificial atoms, for instance for single spin control and manipulation. In this context, this experimental review focuses on the silicon-on-insulator devices produced within microelectronics facilities with only very minor modifications to the current industrial CMOS process and tools. This is required for scalability and enabled by shallow trench or mesa isolation. It also paves the way for real integration with conventional circuits, as illustrated by a nanoscale device coupled to a CMOS circuit producing a radio-frequency drive on-chip. At the device level we emphasize the central role of electrostatics in etched silicon nanowire transistors, which allows to understand the characteristics in the full range from zero to room temperature.

  2. Neutron irradiation test of depleted CMOS pixel detector prototypes

    NASA Astrophysics Data System (ADS)

    Mandić, I.; Cindro, V.; Gorišek, A.; Hiti, B.; Kramberger, G.; Mikuž, M.; Zavrtanik, M.; Hemperek, T.; Daas, M.; Hügging, F.; Krüger, H.; Pohl, D.-L.; Wermes, N.; Gonella, L.

    2017-02-01

    Charge collection properties of depleted CMOS pixel detector prototypes produced on p-type substrate of 2 kΩ cm initial resistivity (by LFoundry 150 nm process) were studied using Edge-TCT method before and after neutron irradiation. The test structures were produced for investigation of CMOS technology in tracking detectors for experiments at HL-LHC upgrade. Measurements were made with passive detector structures in which current pulses induced on charge collecting electrodes could be directly observed. Thickness of depleted layer was estimated and studied as function of neutron irradiation fluence. An increase of depletion thickness was observed after first two irradiation steps to 1 · 1013 n/cm2 and 5 · 1013 n/cm2 and attributed to initial acceptor removal. At higher fluences the depletion thickness at given voltage decreases with increasing fluence because of radiation induced defects contributing to the effective space charge concentration. The behaviour is consistent with that of high resistivity silicon used for standard particle detectors. The measured thickness of the depleted layer after irradiation with 1 · 1015 n/cm2 is more than 50 μm at 100 V bias. This is sufficient to guarantee satisfactory signal/noise performance on outer layers of pixel trackers in HL-LHC experiments.

  3. HIV type 1 V3 serotyping of Tanzanian samples: probable reasons for mismatching with genetic subtyping.

    PubMed

    Hoelscher, M; Hanker, S; Barin, F; Cheingsong-Popov, R; Dietrich, U; Jordan-Harder, B; Olaleye, D; Nägele, E; Markuzzi, A; Mwakagile, D; Minja, F; Weber, J; Gürtler, L; Von Sonnenburg, F

    1998-01-20

    HIV-1 V3 serotyping is used to classify immunodeficiency viruses on the basis of antibody binding to V3 peptides derived from env genetic subtypes. Although it shows a reasonable overlap, it has been reported to be distinct from viral genetic subtypes. The aim of this study is to determine the feasibility of HIV-1 serotyping to predict genetic subtypes in an East African setting, where multiple HIV-1 subtypes have coexisted for many years. HIV-1 genetic subtypes of 86 AIDS patients in Mbeya Town, southwest Tanzania, were determined, using env nucleic acid sequencing as the basis for comparison. Those data were compared with V3 serotyping results obtained by four different methodologies. Four HIV-1 genetic subtypes were identified, including A (25, 29%), C (47, 55%), D (13, 15%), and G (1, 1%). The sensitivity and specificity of those serotyping assays varied considerably: sensitivity for genetic subtype A (40-48%), C (52-96%), and D (9-31%); and specificity for genetic subtype A (77-95%), C (46-63%), and D (97-100%). We further tried to identify reasons for the discrepancies between serotyping results and genetic subtypes. By means of logistic regression analysis three amino acid residues within the V3 loop (positions 12, 13, and 19; V, H, and A for serotype A, I, R, and T for serotype C) were found to be most important for antibody binding; a deviation from the subtype-specific amino acids was highly related to mismatched results. In addition, we have shown that phenetic analysis of V3 amino acid sequence data could be used to predict the majority of V3 serotypes (93-94%). Our data demonstrated that for the majority of specimens HIV-1 V3 serotyping results closely match the subtype of the analyzed sample as revealed by the V3 loop amino acid sequence. However, our data demonstrate that HIV-1 serotyping is not sufficiently accurate to predict genetic subtypes in Tanzania, where subtypes A, C, D, and G are circulating. This was due to highly similar amino acid

  4. Scaling trends in SET pulse widths in Sub-100 nm bulk CMOS processes.

    SciTech Connect

    Narasimham, Balaji; Ahlbin, Jonathan R.; Schrimpf, Ronald D.; Gadlage, Matthew J.; Massengill, Lloyd W.; Vizkelethy, Gyorgy; Reed, Robert A.; Bhuva, Bharat L.

    2010-07-01

    Digital single-event transient (SET) measurements in a bulk 65-nm process are compared to transients measured in 130-nm and 90-nm processes. The measured SET widths are shorter in a 65-nm test circuit than SETs measured in similar 90-nm and 130-nm circuits, but, when the factors affecting the SET width measurements (in particular pulse broadening and the parasitic bipolar effect) are considered, the actual SET width trends are found to be more complex. The differences in the SET widths between test circuits can be attributed in part to differences in n-well contact area. These results help explain some of the inconsistencies in SET measurements presented by various researchers over the past few years.

  5. Investigation of CMOS pixel sensor with 0.18 μm CMOS technology for high-precision tracking detector

    NASA Astrophysics Data System (ADS)

    Zhang, L.; Fu, M.; Zhang, Y.; Yan, W.; Wang, M.

    2017-01-01

    The Circular Electron Positron Collider (CEPC) proposed by the Chinese high energy physics community is aiming to measure Higgs particles and their interactions precisely. The tracking detector including Silicon Inner Tracker (SIT) and Forward Tracking Disks (FTD) has driven stringent requirements on sensor technologies in term of spatial resolution, power consumption and readout speed. CMOS Pixel Sensor (CPS) is a promising candidate to approach these requirements. This paper presents the preliminary studies on the sensor optimization for tracking detector to achieve high collection efficiency while keeping necessary spatial resolution. Detailed studies have been performed on the charge collection using a 0.18 μm CMOS image sensor process. This process allows high resistivity epitaxial layer, leading to a significant improvement on the charge collection and therefore improving the radiation tolerance. Together with the simulation results, the first exploratory prototype has bee designed and fabricated. The prototype includes 9 different pixel arrays, which vary in terms of pixel pitch, diode size and geometry. The total area of the prototype amounts to 2 × 7.88 mm2.

  6. Investigation of HV/HR-CMOS technology for the ATLAS Phase-II Strip Tracker Upgrade

    NASA Astrophysics Data System (ADS)

    Fadeyev, V.; Galloway, Z.; Grabas, H.; Grillo, A. A.; Liang, Z.; Martinez-Mckinney, F.; Seiden, A.; Volk, J.; Affolder, A.; Buckland, M.; Meng, L.; Arndt, K.; Bortoletto, D.; Huffman, T.; John, J.; McMahon, S.; Nickerson, R.; Phillips, P.; Plackett, R.; Shipsey, I.; Vigani, L.; Bates, R.; Blue, A.; Buttar, C.; Kanisauskas, K.; Maneuski, D.; Benoit, M.; Di Bello, F.; Caragiulo, P.; Dragone, A.; Grenier, P.; Kenney, C.; Rubbo, F.; Segal, J.; Su, D.; Tamma, C.; Das, D.; Dopke, J.; Turchetta, R.; Wilson, F.; Worm, S.; Ehrler, F.; Peric, I.; Gregor, I. M.; Stanitzki, M.; Hoeferkamp, M.; Seidel, S.; Hommels, L. B. A.; Kramberger, G.; Mandić, I.; Mikuž, M.; Muenstermann, D.; Wang, R.; Zhang, J.; Warren, M.; Song, W.; Xiu, Q.; Zhu, H.

    2016-09-01

    ATLAS has formed strip CMOS project to study the use of CMOS MAPS devices as silicon strip sensors for the Phase-II Strip Tracker Upgrade. This choice of sensors promises several advantages over the conventional baseline design, such as better resolution, less material in the tracking volume, and faster construction speed. At the same time, many design features of the sensors are driven by the requirement of minimizing the impact on the rest of the detector. Hence the target devices feature long pixels which are grouped to form a virtual strip with binary-encoded z position. The key performance aspects are radiation hardness compatibility with HL-LHC environment, as well as extraction of the full hit position with full-reticle readout architecture. To date, several test chips have been submitted using two different CMOS technologies. The AMS 350 nm is a high voltage CMOS process (HV-CMOS), that features the sensor bias of up to 120 V. The TowerJazz 180 nm high resistivity CMOS process (HR-CMOS) uses a high resistivity epitaxial layer to provide the depletion region on top of the substrate. We have evaluated passive pixel performance, and charge collection projections. The results strongly support the radiation tolerance of these devices to radiation dose of the HL-LHC in the strip tracker region. We also describe design features for the next chip submission that are motivated by our technology evaluation.

  7. High-content analysis of single cells directly assembled on CMOS sensor based on color imaging.

    PubMed

    Tanaka, Tsuyoshi; Saeki, Tatsuya; Sunaga, Yoshihiko; Matsunaga, Tadashi

    2010-12-15

    A complementary metal oxide semiconductor (CMOS) image sensor was applied to high-content analysis of single cells which were assembled closely or directly onto the CMOS sensor surface. The direct assembling of cell groups on CMOS sensor surface allows large-field (6.66 mm×5.32 mm in entire active area of CMOS sensor) imaging within a second. Trypan blue-stained and non-stained cells in the same field area on the CMOS sensor were successfully distinguished as white- and blue-colored images under white LED light irradiation. Furthermore, the chemiluminescent signals of each cell were successfully visualized as blue-colored images on CMOS sensor only when HeLa cells were placed directly on the micro-lens array of the CMOS sensor. Our proposed approach will be a promising technique for real-time and high-content analysis of single cells in a large-field area based on color imaging.

  8. Severe 2009 A/H1N1v influenza in pregnant women in Spain.

    PubMed

    Maraví-Poma, Enrique; Martin-Loeches, Ignacio; Regidor, Eva; Laplaza, Clara; Cambra, Koldo; Aldunate, Sara; Guerrero, Jose Eugenio; Loza-Vazquez, Ana; Arnau, Elena; Almirall, Jordi; Lorente, Leonardo; Arenzana, Angel; Magret, Monica; Reig Valero, Roberto; Marquez, Enrique; Gonzalez, Nagore; Bermejo-Martin, Jesús Francisco; Rello, Jordi

    2011-05-01

    To describe the severity of the 2009 influenza A/H1N1v illness among pregnant women admitted to Spanish intensive care units. Prospective, observational, multicenter study conducted in 148 Spanish intensive care units. We reviewed demographic and clinical data from the Spanish Society of Intensive Care Medicine database reported from April 23, 2009, to February 15, 2010. We included women of reproductive age (15-44 yrs) with confirmed A/H1N1v infection admitted to intensive care units. Two hundred thirty-four women of reproductive age were admitted to intensive care units, 50 (21.4%) of them pregnant. Seven deaths were recorded in pregnant and 22 in nonpregnant women. Among intensive care unit admissions, there were no statistically significant differences between pregnant women and nonpregnant in Acute Physiology and Chronic Health Evaluation II, Sequential Organ Failure Assessment scores, chest x-rays, inotrope requirement, or need for mechanical ventilation or steroid therapy. Mortality risk was significantly associated with Acute Physiology and Chronic Health Evaluation II, Sequential Organ Failure Assessment, and obesity. Viral pneumonia was more frequent in pregnant women than in nonpregnant women, with an odds ratio (adjusted for asthma, time from onset influenza symptoms to hospital admission and obesity) of 4.9 (95% confidence interval: 1.4-17.2). The development of primary viral pneumonia in women of reproductive age appeared to be related to the time of commencement of antiviral treatment, the lowest rates being reported with initiation of antiviral therapy within 48 hrs of symptom onset (63.6% vs. 82.6%, p = .03). However, antiviral therapy was started within this time span in only 14% of pregnant women. More than 20% of women of reproductive age admitted to intensive care unit for pH1N1 infection were pregnant. Pregnancy was significantly associated with primary viral pneumonia. Pregnant women should receive prompt treatment with oseltamivir within 48

  9. Delta-Doped Back-Illuminated CMOS Imaging Arrays: Progress and Prospects

    NASA Technical Reports Server (NTRS)

    Hoenk, Michael E.; Jones, Todd J.; Dickie, Matthew R.; Greer, Frank; Cunningham, Thomas J.; Blazejewski, Edward; Nikzad, Shouleh

    2009-01-01

    In this paper, we report the latest results on our development of delta-doped, thinned, back-illuminated CMOS imaging arrays. As with charge-coupled devices, thinning and back-illumination are essential to the development of high performance CMOS imaging arrays. Problems with back surface passivation have emerged as critical to the prospects for incorporating CMOS imaging arrays into high performance scientific instruments, just as they did for CCDs over twenty years ago. In the early 1990's, JPL developed delta-doped CCDs, in which low temperature molecular beam epitaxy was used to form an ideal passivation layer on the silicon back surface. Comprising only a few nanometers of highly-doped epitaxial silicon, delta-doping achieves the stability and uniformity that are essential for high performance imaging and spectroscopy. Delta-doped CCDs were shown to have high, stable, and uniform quantum efficiency across the entire spectral range from the extreme ultraviolet through the near infrared. JPL has recently bump-bonded thinned, delta-doped CMOS imaging arrays to a CMOS readout, and demonstrated imaging. Delta-doped CMOS devices exhibit the high quantum efficiency that has become the standard for scientific-grade CCDs. Together with new circuit designs for low-noise readout currently under development, delta-doping expands the potential scientific applications of CMOS imaging arrays, and brings within reach important new capabilities, such as fast, high-sensitivity imaging with parallel readout and real-time signal processing. It remains to demonstrate manufacturability of delta-doped CMOS imaging arrays. To that end, JPL has acquired a new silicon MBE and ancillary equipment for delta-doping wafers up to 200mm in diameter, and is now developing processes for high-throughput, high yield delta-doping of fully-processed wafers with CCD and CMOS imaging devices.

  10. Delta-Doped Back-Illuminated CMOS Imaging Arrays: Progress and Prospects

    NASA Technical Reports Server (NTRS)

    Hoenk, Michael E.; Jones, Todd J.; Dickie, Matthew R.; Greer, Frank; Cunningham, Thomas J.; Blazejewski, Edward; Nikzad, Shouleh

    2009-01-01

    In this paper, we report the latest results on our development of delta-doped, thinned, back-illuminated CMOS imaging arrays. As with charge-coupled devices, thinning and back-illumination are essential to the development of high performance CMOS imaging arrays. Problems with back surface passivation have emerged as critical to the prospects for incorporating CMOS imaging arrays into high performance scientific instruments, just as they did for CCDs over twenty years ago. In the early 1990's, JPL developed delta-doped CCDs, in which low temperature molecular beam epitaxy was used to form an ideal passivation layer on the silicon back surface. Comprising only a few nanometers of highly-doped epitaxial silicon, delta-doping achieves the stability and uniformity that are essential for high performance imaging and spectroscopy. Delta-doped CCDs were shown to have high, stable, and uniform quantum efficiency across the entire spectral range from the extreme ultraviolet through the near infrared. JPL has recently bump-bonded thinned, delta-doped CMOS imaging arrays to a CMOS readout, and demonstrated imaging. Delta-doped CMOS devices exhibit the high quantum efficiency that has become the standard for scientific-grade CCDs. Together with new circuit designs for low-noise readout currently under development, delta-doping expands the potential scientific applications of CMOS imaging arrays, and brings within reach important new capabilities, such as fast, high-sensitivity imaging with parallel readout and real-time signal processing. It remains to demonstrate manufacturability of delta-doped CMOS imaging arrays. To that end, JPL has acquired a new silicon MBE and ancillary equipment for delta-doping wafers up to 200mm in diameter, and is now developing processes for high-throughput, high yield delta-doping of fully-processed wafers with CCD and CMOS imaging devices.

  11. High-performance VGA-resolution digital color CMOS imager

    NASA Astrophysics Data System (ADS)

    Agwani, Suhail; Domer, Steve; Rubacha, Ray; Stanley, Scott

    1999-04-01

    This paper discusses the performance of a new VGA resolution color CMOS imager developed by Motorola on a 0.5micrometers /3.3V CMOS process. This fully integrated, high performance imager has on chip timing, control, and analog signal processing chain for digital imaging applications. The picture elements are based on 7.8micrometers active CMOS pixels that use pinned photodiodes for higher quantum efficiency and low noise performance. The image processing engine includes a bank of programmable gain amplifiers, line rate clamping for dark offset removal, real time auto white balancing, per column gain and offset calibration, and a 10 bit pipelined RSD analog to digital converter with a programmable input range. Post ADC signal processing includes features such as bad pixel replacement based on user defined thresholds levels, 10 to 8 bit companding and 5 tap FIR filtering. The sensor can be programmed via a standard I2C interface that runs on 3.3V clocks. Programmable features include variable frame rates using a constant frequency master clock, electronic exposure control, continuous or single frame capture, progressive or interlace scanning modes. Each pixel is individually addressable allowing region of interest imaging and image subsampling. The sensor operates with master clock frequencies of up to 13.5MHz resulting in 30FPS. A total programmable gain of 27dB is available. The sensor power dissipation is 400mW at full speed of operation. The low noise design yields a measured 'system on a chip' dynamic range of 50dB thus giving over 8 true bits of resolution. Extremely high conversion gain result in an excellent peak sensitivity of 22V/(mu) J/cm2 or 3.3V/lux-sec. This monolithic image capture and processing engine represent a compete imaging solution making it a true 'camera on a chip'. Yet in its operation it remains extremely easy to use requiring only one clock and a 3.3V power supply. Given the available features and performance levels, this sensor will be

  12. Evaluation of sCMOS cameras for detection and localization of single Cy5 molecules.

    PubMed

    Saurabh, Saumya; Maji, Suvrajit; Bruchez, Marcel P

    2012-03-26

    The ability to detect single molecules over the electronic noise requires high performance detector systems. Electron Multiplying Charge-Coupled Device (EMCCD) cameras have been employed successfully to image single molecules. Recently, scientific Complementary Metal Oxide Semiconductor (sCMOS) based cameras have been introduced with very low read noise at faster read out rates, smaller pixel sizes and a lower price compared to EMCCD cameras. In this study, we have compared the two technologies using two EMCCD and three sCMOS cameras to detect single Cy5 molecules. Our findings indicate that the sCMOS cameras perform similar to EMCCD cameras for detecting and localizing single Cy5 molecules.

  13. A platform for monolithic CMOS-MEMS integration on SOI wafers

    NASA Astrophysics Data System (ADS)

    Villarroya, María; Figueras, Eduard; Montserrat, Josep; Verd, Jaume; Teva, Jordi; Abadal, Gabriel; Pérez Murano, Francesc; Esteve, Jaume; Barniol, Núria

    2006-10-01

    A new platform for micro- and nano-electromechanical systems based on crystalline silicon as the structural layer in CMOS substrates is presented. This platform is fabricated using silicon on insulator (SOI) substrates, which allows the monolithic integration of the mechanical transducer on crystalline silicon while the characteristics of the structural layer are kept independent from the CMOS technology. We report the design characteristics, the fabrication process and an example of application of the CMOS SOI-MEMS platform to obtain a mass sensor based on a crystalline silicon resonating cantilever.

  14. Proof of principle study of the use of a CMOS active pixel sensor for proton radiography.

    PubMed

    Seco, Joao; Depauw, Nicolas

    2011-02-01

    Proof of principle study of the use of a CMOS active pixel sensor (APS) in producing proton radiographic images using the proton beam at the Massachusetts General Hospital (MGH). A CMOS APS, previously tested for use in s-ray radiation therapy applications, was used for proton beam radiographic imaging at the MGH. Two different setups were used as a proof of principle that CMOS can be used as proton imaging device: (i) a pen with two metal screws to assess spatial resolution of the CMOS and (ii) a phantom with lung tissue, bone tissue, and water to assess tissue contrast of the CMOS. The sensor was then traversed by a double scattered monoenergetic proton beam at 117 MeV, and the energy deposition inside the detector was recorded to assess its energy response. Conventional x-ray images with similar setup at voltages of 70 kVp and proton images using commercial Gafchromic EBT 2 and Kodak X-Omat V films were also taken for comparison purposes. Images were successfully acquired and compared to x-ray kVp and proton EBT2/X-Omat film images. The spatial resolution of the CMOS detector image is subjectively comparable to the EBT2 and Kodak X-Omat V film images obtained at the same object-detector distance. X-rays have apparent higher spatial resolution than the CMOS. However, further studies with different commercial films using proton beam irradiation demonstrate that the distance of the detector to the object is important to the amount of proton scatter contributing to the proton image. Proton images obtained with films at different distances from the source indicate that proton scatter significantly affects the CMOS image quality. Proton radiographic images were successfully acquired at MGH using a CMOS active pixel sensor detector. The CMOS demonstrated spatial resolution subjectively comparable to films at the same object-detector distance. Further work will be done in order to establish the spatial and energy resolution of the CMOS detector for protons. The

  15. CMOS Time-Resolved, Contact, and Multispectral Fluorescence Imaging for DNA Molecular Diagnostics

    PubMed Central

    Guo, Nan; Cheung, Ka Wai; Wong, Hiu Tung; Ho, Derek

    2014-01-01

    Instrumental limitations such as bulkiness and high cost prevent the fluorescence technique from becoming ubiquitous for point-of-care deoxyribonucleic acid (DNA) detection and other in-field molecular diagnostics applications. The complimentary metal-oxide-semiconductor (CMOS) technology, as benefited from process scaling, provides several advanced capabilities such as high integration density, high-resolution signal processing, and low power consumption, enabling sensitive, integrated, and low-cost fluorescence analytical platforms. In this paper, CMOS time-resolved, contact, and multispectral imaging are reviewed. Recently reported CMOS fluorescence analysis microsystem prototypes are surveyed to highlight the present state of the art. PMID:25365460

  16. A functional hybrid memristor crossbar-array/CMOS system for data storage and neuromorphic applications.

    PubMed

    Kim, Kuk-Hwan; Gaba, Siddharth; Wheeler, Dana; Cruz-Albrecht, Jose M; Hussain, Tahir; Srinivasa, Narayan; Lu, Wei

    2012-01-11

    Crossbar arrays based on two-terminal resistive switches have been proposed as a leading candidate for future memory and logic applications. Here we demonstrate a high-density, fully operational hybrid crossbar/CMOS system composed of a transistor- and diode-less memristor crossbar array vertically integrated on top of a CMOS chip by taking advantage of the intrinsic nonlinear characteristics of the memristor element. The hybrid crossbar/CMOS system can reliably store complex binary and multilevel 1600 pixel bitmap images using a new programming scheme.

  17. Top-Down CMOS-NEMS Polysilicon Nanowire with Piezoresistive Transduction

    PubMed Central

    Marigó, Eloi; Sansa, Marc; Pérez-Murano, Francesc; Uranga, Arantxa; Barniol, Núria

    2015-01-01

    A top-down clamped-clamped beam integrated in a CMOS technology with a cross section of 500 nm × 280 nm has been electrostatic actuated and sensed using two different transduction methods: capacitive and piezoresistive. The resonator made from a single polysilicon layer has a fundamental in-plane resonance at 27 MHz. Piezoresistive transduction avoids the effect of the parasitic capacitance assessing the capability to use it and enhance the CMOS-NEMS resonators towards more efficient oscillator. The displacement derived from the capacitive transduction allows to compute the gauge factor for the polysilicon material available in the CMOS technology. PMID:26184222

  18. Top-Down CMOS-NEMS Polysilicon Nanowire with Piezoresistive Transduction.

    PubMed

    Marigó, Eloi; Sansa, Marc; Pérez-Murano, Francesc; Uranga, Arantxa; Barniol, Núria

    2015-07-14

    A top-down clamped-clamped beam integrated in a CMOS technology with a cross section of 500 nm × 280 nm has been electrostatic actuated and sensed using two different transduction methods: capacitive and piezoresistive. The resonator made from a single polysilicon layer has a fundamental in-plane resonance at 27 MHz. Piezoresistive transduction avoids the effect of the parasitic capacitance assessing the capability to use it and enhance the CMOS-NEMS resonators towards more efficient oscillator. The displacement derived from the capacitive transduction allows to compute the gauge factor for the polysilicon material available in the CMOS technology.

  19. Steps toward fabricating cryogenic CMOS compatible single electron devices for future qubits.

    SciTech Connect

    Wendt, Joel Robert; Childs, Kenton David; Ten Eyck, Gregory A.; Tracy, Lisa A.; Eng, Kevin; Stevens, Jeffrey; Nordberg, Eric; Carroll, Malcolm S.; Lilly, Michael Patrick

    2008-08-01

    We describe the development of a novel silicon quantum bit (qubit) device architecture that involves using materials that are compatible with a Sandia National Laboratories (SNL) 0.35 mum complementary metal oxide semiconductor (CMOS) process intended to operate at 100 mK. We describe how the qubit structure can be integrated with CMOS electronics, which is believed to have advantages for critical functions like fast single electron electrometry for readout compared to current approaches using radio frequency techniques. Critical materials properties are reviewed and preliminary characterization of the SNL CMOS devices at 4.2 K is presented.

  20. Proof of principle study of the use of a CMOS active pixel sensor for proton radiography

    SciTech Connect

    Seco, Joao; Depauw, Nicolas

    2011-02-15

    Purpose: Proof of principle study of the use of a CMOS active pixel sensor (APS) in producing proton radiographic images using the proton beam at the Massachusetts General Hospital (MGH). Methods: A CMOS APS, previously tested for use in s-ray radiation therapy applications, was used for proton beam radiographic imaging at the MGH. Two different setups were used as a proof of principle that CMOS can be used as proton imaging device: (i) a pen with two metal screws to assess spatial resolution of the CMOS and (ii) a phantom with lung tissue, bone tissue, and water to assess tissue contrast of the CMOS. The sensor was then traversed by a double scattered monoenergetic proton beam at 117 MeV, and the energy deposition inside the detector was recorded to assess its energy response. Conventional x-ray images with similar setup at voltages of 70 kVp and proton images using commercial Gafchromic EBT 2 and Kodak X-Omat V films were also taken for comparison purposes. Results: Images were successfully acquired and compared to x-ray kVp and proton EBT2/X-Omat film images. The spatial resolution of the CMOS detector image is subjectively comparable to the EBT2 and Kodak X-Omat V film images obtained at the same object-detector distance. X-rays have apparent higher spatial resolution than the CMOS. However, further studies with different commercial films using proton beam irradiation demonstrate that the distance of the detector to the object is important to the amount of proton scatter contributing to the proton image. Proton images obtained with films at different distances from the source indicate that proton scatter significantly affects the CMOS image quality. Conclusion: Proton radiographic images were successfully acquired at MGH using a CMOS active pixel sensor detector. The CMOS demonstrated spatial resolution subjectively comparable to films at the same object-detector distance. Further work will be done in order to establish the spatial and energy resolution of the

  1. Accelerated life testing effects on CMOS microcircuit characteristics

    NASA Technical Reports Server (NTRS)

    1980-01-01

    The 250 C, 200C and 125C accelerated tests are described. The wear-out distributions from the 250 and 200 C tests were used to estimate the activation energy between the two test temperatures. The duration of the 125 C test was not sufficient to bring the test devices into the wear-out region. It was estimated that, for the most complex of the three devices types, the activation energy between 200 C and 125 C should be at least as high as that between 250 C and 200 C. The practicality of the use of high temperature for the accelerated life tests from the point of view of durability of equipment is assessed. Guidlines for the development of accelerated life-test conditions are proposed. The use of the silicon nitride overcoat to improve the high temperature accelerated life-test characteristics of CMOS microcircuits is described.

  2. A portable swappable method scientific CMOS image data storage system

    NASA Astrophysics Data System (ADS)

    Liu, Wen-long; Pi, Hai-feng; Hu, Bing-liang; Gao, Jia-rui

    2015-11-01

    In the field of deep space exploration, the detector needs high-speed data real-time transmission and large capacity storage. SATA(Serial advanced technology attachment) as a new generation of interface protocols, SATA interface hard disk has the advantages of with large storage capacity, high transmission rate, the cheap price, data is not lost when power supply drop, so it is suitable for used in high speed large capacity data storage system. This paper by using Kintex-7 XCE7K325T XILINK series FPGA, the data of scientific CMOS CIS2521F through the SATA controller is stored in the hard disk. If the hard disk storage is full, it will automatically switch to the next hard disk.

  3. An Approach for Self-Timed Synchronous CMOS Circuit Design

    NASA Technical Reports Server (NTRS)

    Walker, Alvernon; Lala, Parag K.

    2001-01-01

    In this letter we present a timing and control strategy that can be used to realize synchronous systems with a level of performance that approaches that of asynchronous circuits or systems. This approach is based upon a single-phase synchronous circuit/system architecture with a variable period clock. The handshaking signals required for asynchronous self-timed circuits are not needed. Dynamic power supply current monitoring is used to generate the timing information, that is comparable to the completion signal found in self-timed circuits; this timing information is used to modi@ the circuit clock period. This letter is concluded with an example of the proposed approach applied to a static CMOS ripple-carry adder.

  4. Rapid Bacterial Detection via an All-Electronic CMOS Biosensor.

    PubMed

    Nikkhoo, Nasim; Cumby, Nichole; Gulak, P Glenn; Maxwell, Karen L

    2016-01-01

    The timely and accurate diagnosis of infectious diseases is one of the greatest challenges currently facing modern medicine. The development of innovative techniques for the rapid and accurate identification of bacterial pathogens in point-of-care facilities using low-cost, portable instruments is essential. We have developed a novel all-electronic biosensor that is able to identify bacteria in less than ten minutes. This technology exploits bacteriocins, protein toxins naturally produced by bacteria, as the selective biological detection element. The bacteriocins are integrated with an array of potassium-selective sensors in Complementary Metal Oxide Semiconductor technology to provide an inexpensive bacterial biosensor. An electronic platform connects the CMOS sensor to a computer for processing and real-time visualization. We have used this technology to successfully identify both Gram-positive and Gram-negative bacteria commonly found in human infections.

  5. A 20 MHz CMOS reorder buffer for a superscalar microprocessor

    NASA Technical Reports Server (NTRS)

    Lenell, John; Wallace, Steve; Bagherzadeh, Nader

    1992-01-01

    Superscalar processors can achieve increased performance by issuing instructions out-of-order from the original sequential instruction stream. Implementing an out-of-order instruction issue policy requires a hardware mechanism to prevent incorrectly executed instructions from updating register values. A reorder buffer can be used to allow a superscalar processor to issue instructions out-of-order and maintain program correctness. This paper describes the design and implementation of a 20MHz CMOS reorder buffer for superscalar processors. The reorder buffer is designed to accept and retire two instructions per cycle. A full-custom layout in 1.2 micron has been implemented, measuring 1.1058 mm by 1.3542 mm.

  6. Time-resolved CMOS SPAD arrays: architectures, applications and perspectives

    NASA Astrophysics Data System (ADS)

    Villa, Federica; Lussana, Rudi; Portaluppi, Davide; Tosi, Alberto; Zappa, Franco

    2017-05-01

    SPADs (Single-Photon Avalanche Diodes) are the viable photodetectors for most single-photon counting and photontiming applications. Some custom SPAD and many complementary metal-oxide semiconductor (CMOS) SPADs have been reported in literature, with quite different performance and some excelling in just few of them, but often at different operating conditions. Proper performance assessment can be done through figures of merit able to summarize the typical SPAD performance (i.e. photon detection efficiency, dark counting rate, afterpulsing probability, hold-off time, and timing jitter) and to identify a proper metric for SPAD comparisons, when used either as single pixel detectors or in imaging arrays. We present a comparison among some imager architectures and SPAD detectors and arrays in either photon-counting, timing, or imaging applications.

  7. Failure analysis of a half-micron CMOS IC technology

    SciTech Connect

    Liang, A.Y.; Tangyunyong, P.; Bennett, R.S.; Flores, R.S.

    1996-08-01

    We present the results of recent failure analysis of an advanced, 0.5 {mu}m, fully planarized, triple metallization CMOS technology. A variety of failure analysis (FA) tools and techniques were used to localize and identify defects generated by wafer processing. These include light (photon) emission microscopy (LE), fluorescent microthermal imaging (FMI), focused ion beam cross sectioning, SEM/voltage contrast imaging, resistive contrast imaging (RCI), and e-beam testing using an IDS-5000 with an HP 82000. The defects identified included inter- and intra-metal shorts, gate oxide shorts due to plasma processing damage, and high contact resistance due to the contact etch and deposition process. Root causes of these defects were determined and corrective action was taken to improve yield and reliability.

  8. Triple inverter pierce oscillator circuit suitable for CMOS

    DOEpatents

    Wessendorf; Kurt O.

    2007-02-27

    An oscillator circuit is disclosed which can be formed using discrete field-effect transistors (FETs), or as a complementary metal-oxide-semiconductor (CMOS) integrated circuit. The oscillator circuit utilizes a Pierce oscillator design with three inverter stages connected in series. A feedback resistor provided in a feedback loop about a second inverter stage provides an almost ideal inverting transconductance thereby allowing high-Q operation at the resonator-controlled frequency while suppressing a parasitic oscillation frequency that is inherent in a Pierce configuration using a "standard" triple inverter for the sustaining amplifier. The oscillator circuit, which operates in a range of 10 50 MHz, has applications for use as a clock in a microprocessor and can also be used for sensor applications.

  9. Broadband terahertz imaging with highly sensitive silicon CMOS detectors.

    PubMed

    Schuster, Franz; Coquillat, Dominique; Videlier, Hadley; Sakowicz, Maciej; Teppe, Frédéric; Dussopt, Laurent; Giffard, Benoît; Skotnicki, Thomas; Knap, Wojciech

    2011-04-11

    This paper investigates terahertz detectors fabricated in a low-cost 130 nm silicon CMOS technology. We show that the detectors consisting of a nMOS field effect transistor as rectifying element and an integrated bow-tie coupling antenna achieve a record responsivity above 5 kV/W and a noise equivalent power below 10 pW/Hz(0.5) in the important atmospheric window around 300 GHz and at room temperature. We demonstrate furthermore that the same detectors are efficient for imaging in a very wide frequency range from ~0.27 THz up to 1.05 THz. These results pave the way towards high sensitivity focal plane arrays in silicon for terahertz imaging.

  10. Micro-lens maker equation of a CMOS image sensor

    NASA Astrophysics Data System (ADS)

    Wu, Yang

    2007-09-01

    The demand of a large resolution CMOS image sensor (CIS) in a small package drives the pixel pitch size down to the neighborhood of 2 μm. Double-micro-lens (ML) structure is a promising technology to obtain the high focusing capability required by such a small pixel. In this work, an optical model of a double-ML is derived from the well-known lens maker equation. This model predicts the critical back focal length (BFL) and the effective focal length (EFL) of the double-ML embedded in the Back-End-Of-The-Line (BEOL) stack. Explained by this model, a design guideline is provided to optimize the amount of light collected by the photo diode area for a good quantum efficiency (QE), which is crucial to the sensitivity of the sensor.

  11. CMOS capacitive biosensors for highly sensitive biosensing applications.

    PubMed

    Chang, An-Yu; Lu, Michael S-C

    2013-01-01

    Magnetic microbeads are widely used in biotechnology and biomedical research for manipulation and detection of cells and biomolecules. Most lab-on-chip systems capable of performing manipulation and detection require external instruments to perform one of the functions, leading to increased size and cost. This work aims at developing an integrated platform to perform these two functions by implementing electromagnetic microcoils and capacitive biosensors on a CMOS (complementary metal oxide semiconductor) chip. Compared to most magnetic-type sensors, our detection method requires no externally applied magnetic fields and the associated fabrication is less complicated. In our experiment, microbeads coated with streptavidin were driven to the sensors located in the center of microcoils with functionalized anti-streptavidin antibody. Detection of a single microbead was successfully demonstrated using a capacitance-to-frequency readout. The average capacitance changes for the experimental and control groups were -5.3 fF and -0.2 fF, respectively.

  12. Heavy ion microscopy of single event upsets in CMOS SRAMs

    SciTech Connect

    Metzger, S.; Dreute, J.; Heinrich, W.; Roecher, H. ); Fischer, B.E. ); Harboe-Soerensen, R.; Adams, L. )

    1994-06-01

    The single event upset (SEU) imaging has been applied at the GSI heavy ion microprobe to determine the sensitivity of integrated circuits (IC) to heavy ion irradiation. This method offers the possibility to directly image those parts of an IC which are sensitive to ion-induced malfunctions. By a 3-dimensional simulation of charge collection across p-n-micro-junctions the authors can predict SEU cross-sections. For a MHS65162 2k [times] 8bit CMOS SRAM they found two regions per bit with different sensitivity and measured a total cross-section of (71[+-]18)[mu]m[sup 2] for a bitflip per cell and simulated 60[mu]m[sup 2] with an argon beam of 1.4 MeV/nucl. (LET of 19.7 MeV/mg/cm[sup 2]).

  13. Cryogenic CMOS cameras for high voltage monitoring in liquid argon

    NASA Astrophysics Data System (ADS)

    McConkey, N.; Spooner, N.; Thiesse, M.; Wallbank, M.; Warburton, T. K.

    2017-03-01

    The prevalent use of large volume liquid argon detectors strongly motivates the development of novel readout and monitoring technology which functions at cryogenic temperatures. This paper presents the development of a cryogenic CMOS camera system suitable for use inside a large volume liquid argon detector for online monitoring purposes. The characterisation of the system is described in detail. The reliability of such a camera system has been demonstrated over several months, and recent data from operation within the liquid argon region of the DUNE 35 t cryostat is presented. The cameras were used to monitor for high voltage breakdown inside the cryostat, with capability to observe breakdown of a liquid argon time projection chamber in situ. They were also used for detector monitoring, especially of components during cooldown.

  14. Pauli spin blockade in CMOS double quantum dot devices

    NASA Astrophysics Data System (ADS)

    Kotekar-Patil, D.; Corna, A.; Maurand, R.; Crippa, A.; Orlov, A.; Barraud, S.; Hutin, L.; Vinet, M.; Jehl, X.; De Franceschi, S.; Sanquer, M.

    2017-03-01

    Silicon quantum dots are attractive candidates for the development of scalable, spin-based qubits. Pauli spin blockade in double quantum dots provides an efficient, temperature independent mechanism for qubit readout. Here we report on transport experiments in double gate nanowire transistors issued from a CMOS process on 300 mm silicon-on-insulator wafers. At low temperature the devices behave as two few-electron quantum dots in series. We observe signatures of Pauli spin blockade with a singlet-triplet splitting ranging from 0.3 to 1.3 meV. Magneto-transport measurements show that transitions which conserve spin are shown to be magnetic-field independent up to B = 6 T.

  15. Reliability Considerations of ULP Scaled CMOS in Spacecraft Systems

    NASA Technical Reports Server (NTRS)

    White, Mark; MacNeal, Kristen; Cooper, Mark

    2012-01-01

    NASA, the aerospace community, and other high reliability (hi-rel) users of advanced microelectronic products face many challenges as technology continues to scale into the deep sub-micron region. Decreasing the feature size of CMOS devices not only allows more components to be placed on a single chip, but it increases performance by allowing faster switching (or clock) speeds with reduced power compared to larger scaled devices. Higher performance, and lower operating and stand-by power characteristics of Ultra-Low Power (ULP) microelectronics are not only desirable, but also necessary to meet low power consumption design goals of critical spacecraft systems. The integration of these components in such systems, however, must be balanced with the overall risk tolerance of the project.

  16. Development of a radiation-hard CMOS process

    NASA Technical Reports Server (NTRS)

    Power, W. L.

    1983-01-01

    It is recommended that various techniques be investigated which appear to have the potential for improving the radiation hardness of CMOS devices for prolonged space flight mission. The three key recommended processing techniques are: (1) making the gate oxide thin. It has been shown that radiation degradation is proportional to the cube of oxide thickness so that a relatively small reduction in thickness can greatly improve radiation resistance; (2) cleanliness and contamination control; and (3) to investigate different oxide growth (low temperature dry, TCE and HCL). All three produce high quality clean oxides, which are more radiation tolerant. Technique 2 addresses the reduction of metallic contamination. Technique 3 will produce a higher quality oxide by using slow growth rate conditions, and will minimize the effects of any residual sodium contamination through the introduction of hydrogen and chlorine into the oxide during growth.

  17. Rapid Bacterial Detection via an All-Electronic CMOS Biosensor

    PubMed Central

    Nikkhoo, Nasim; Cumby, Nichole; Gulak, P. Glenn; Maxwell, Karen L.

    2016-01-01

    The timely and accurate diagnosis of infectious diseases is one of the greatest challenges currently facing modern medicine. The development of innovative techniques for the rapid and accurate identification of bacterial pathogens in point-of-care facilities using low-cost, portable instruments is essential. We have developed a novel all-electronic biosensor that is able to identify bacteria in less than ten minutes. This technology exploits bacteriocins, protein toxins naturally produced by bacteria, as the selective biological detection element. The bacteriocins are integrated with an array of potassium-selective sensors in Complementary Metal Oxide Semiconductor technology to provide an inexpensive bacterial biosensor. An electronic platform connects the CMOS sensor to a computer for processing and real-time visualization. We have used this technology to successfully identify both Gram-positive and Gram-negative bacteria commonly found in human infections. PMID:27618185

  18. Stripe rust resistance and dough quality of new wheat - Dasypyrum villosum translocation lines T1DL•1V#3S and T1DS•1V#3L and the location of HMW-GS genes.

    PubMed

    Zhao, W C; Gao, X; Dong, J; Zhao, Z J; Chen, Q G; Chen, L G; Shi, Y G; Li, X Y

    2015-07-17

    The transfer of agronomically useful genes from wild wheat species into cultivated wheat is one of the most effective approaches to improvement of wheat varieties. To evaluate the transfer of genes from Dasypyrum villosum into Triticum aestivum, wheat quality and disease resistance was evaluated in two new translocation lines, T1DL•1V#3S and T1DS•1V#3L. We examined the levels of stripe rust resistance and dough quality in the two lines, and identified and located the stripe rust resistant genes and high molecular weight glutenin subunit (HMW-GS) genes Glu-V1 of D. villosum. Compared to the Chinese Spring (CS) variety, T1DL•1V#3S plants showed moderate resistance to moderate susceptibility to the stripe rust races CYR33 and Su11-4. However, T1DS•1V#3L plants showed high resistance or immunity to these stripe rusts. The genes for resistance to stripe rust were located on 1VL of D. villosum. In comparison to CS, the dough from T1DS•1V#3L had a significantly shorter developing time (1.45 min) and stable time (1.0 min), a higher weakness in gluten strength (208.5 FU), and a lower farinograph quality index (18). T1DL•1V#3S had a significantly longer developing time (4.2 min) and stable time (5.25 min), a lower weakness in gluten strength (53 FU) and a higher farinograph quality index (78.5). We also found that T1DS•1V#3L had reduced gluten strength and dough quality compared to CS, but T1DL•1V#3S had increased gluten strength and dough quality. The results of SDS-PAGE analysis indicated that Glu-V1 of D. villosum was located on short arm 1VS and long arm 1VL. These results prove that the new translocation lines, T1DS•1V#3L and T1DS•1V#3L, have valuable stripe rust resistance and dough quality traits that will be important for improving wheat quality and resistance in future wheat breeding programs.

  19. Packaging commercial CMOS chips for lab on a chip integration.

    PubMed

    Datta-Chaudhuri, Timir; Abshire, Pamela; Smela, Elisabeth

    2014-05-21

    Combining integrated circuitry with microfluidics enables lab-on-a-chip (LOC) devices to perform sensing, freeing them from benchtop equipment. However, this integration is challenging with small chips, as is briefly reviewed with reference to key metrics for package comparison. In this paper we present a simple packaging method for including mm-sized, foundry-fabricated dies containing complementary metal oxide semiconductor (CMOS) circuits within LOCs. The chip is embedded in an epoxy handle wafer to yield a level, large-area surface, allowing subsequent photolithographic post-processing and microfluidic integration. Electrical connection off-chip is provided by thin film metal traces passivated with parylene-C. The parylene is patterned to selectively expose the active sensing area of the chip, allowing direct interaction with a fluidic environment. The method accommodates any die size and automatically levels the die and handle wafer surfaces. Functionality was demonstrated by packaging two different types of CMOS sensor ICs, a bioamplifier chip with an array of surface electrodes connected to internal amplifiers for recording extracellular electrical signals and a capacitance sensor chip for monitoring cell adhesion and viability. Cells were cultured on the surface of both types of chips, and data were acquired using a PC. Long term culture (weeks) showed the packaging materials to be biocompatible. Package lifetime was demonstrated by exposure to fluids over a longer duration (months), and the package was robust enough to allow repeated sterilization and re-use. The ease of fabrication and good performance of this packaging method should allow wide adoption, thereby spurring advances in miniaturized sensing systems.

  20. Using of a modulated CMOS camera for fluorescence lifetime microscopy

    PubMed Central

    Chen, Hongtao; Holst, Gerhard

    2016-01-01

    Widefield frequency-domain fluorescence lifetime imaging microscopy (FD-FLIM) is a fast and accurate method to measure the fluorescence lifetime of entire images. However, the complexity and high costs involved in construction of such a system limit the extensive use of this technique. PCO AG recently released the first luminescence lifetime imaging camera based on a high frequency modulated CMOS image sensor, QMFLIM2. Here we tested and provide operational procedures to calibrate the camera and to improve the accuracy using corrections necessary for image analysis. With its flexible input/output options, we are able to use a modulated laser diode or a 20MHz pulsed white supercontinuum laser as the light source. The output of the camera consists of a stack of modulated images that can be analyzed by the SimFCS software using the phasor approach. The non-uniform system response across the image sensor must be calibrated at the pixel level. This pixel calibration is crucial and needed for every camera settings, e.g. modulation frequency and exposure time. A significant dependency of the modulation signal on the intensity was also observed and hence an additional calibration is needed for each pixel depending on the pixel intensity level. These corrections are important not only for the fundamental frequency, but also for the higher harmonics when using the pulsed supercontinuum laser. With these post data acquisition corrections, the PCO CMOS-FLIM camera can be used for various biomedical applications requiring a large frame and high speed acquisition. PMID:26500051

  1. A CMOS Neural Interface for a Multichannel Vestibular Prosthesis.

    PubMed

    Hageman, Kristin N; Kalayjian, Zaven K; Tejada, Francisco; Chiang, Bryce; Rahman, Mehdi A; Fridman, Gene Y; Dai, Chenkai; Pouliquen, Philippe O; Georgiou, Julio; Della Santina, Charles C; Andreou, Andreas G

    2016-04-01

    We present a high-voltage CMOS neural-interface chip for a multichannel vestibular prosthesis (MVP) that measures head motion and modulates vestibular nerve activity to restore vision- and posture-stabilizing reflexes. This application specific integrated circuit neural interface (ASIC-NI) chip was designed to work with a commercially available microcontroller, which controls the ASIC-NI via a fast parallel interface to deliver biphasic stimulation pulses with 9-bit programmable current amplitude via 16 stimulation channels. The chip was fabricated in the ONSemi C5 0.5 micron, high-voltage CMOS process and can accommodate compliance voltages up to 12 V, stimulating vestibular nerve branches using biphasic current pulses up to 1.45±0.06 mA with durations as short as 10 μs/phase. The ASIC-NI includes a dedicated digital-to-analog converter for each channel, enabling it to perform complex multipolar stimulation. The ASIC-NI replaces discrete components that cover nearly half of the 2nd generation MVP (MVP2) printed circuit board, reducing the MVP system size by 48% and power consumption by 17%. Physiological tests of the ASIC-based MVP system (MVP2A) in a rhesus monkey produced reflexive eye movement responses to prosthetic stimulation similar to those observed when using the MVP2. Sinusoidal modulation of stimulus pulse rate from 68-130 pulses per second at frequencies from 0.1 to 5 Hz elicited appropriately-directed slow phase eye velocities ranging in amplitude from 1.9-16.7 °/s for the MVP2 and 2.0-14.2 °/s for the MVP2A. The eye velocities evoked by MVP2 and MVP2A showed no significant difference ( t-test, p=0.34), suggesting that the MVP2A achieves performance at least as good as the larger MVP2.

  2. A CMOS Neural Interface for a Multichannel Vestibular Prosthesis

    PubMed Central

    Hageman, Kristin N.; Kalayjian, Zaven K.; Tejada, Francisco; Chiang, Bryce; Rahman, Mehdi A.; Fridman, Gene Y.; Dai, Chenkai; Pouliquen, Philippe O.; Georgiou, Julio; Della Santina, Charles C.; Andreou, Andreas G.

    2015-01-01

    We present a high-voltage CMOS neural-interface chip for a multichannel vestibular prosthesis (MVP) that measures head motion and modulates vestibular nerve activity to restore vision- and posture-stabilizing reflexes. This application specific integrated circuit neural interface (ASIC-NI) chip was designed to work with a commercially available microcontroller, which controls the ASIC-NI via a fast parallel interface to deliver biphasic stimulation pulses with 9-bit programmable current amplitude via 16 stimulation channels. The chip was fabricated in the ONSemi C5 0.5 micron, high-voltage CMOS process and can accommodate compliance voltages up to 12 V, stimulating vestibular nerve branches using biphasic current pulses up to 1.45 ± 0.06 mA with durations as short as 10 µs/phase. The ASIC-NI includes a dedicated digital-to-analog converter for each channel, enabling it to perform complex multipolar stimulation. The ASIC-NI replaces discrete components that cover nearly half of the 2nd generation MVP (MVP2) printed circuit board, reducing the MVP system size by 48% and power consumption by 17%. Physiological tests of the ASIC-based MVP system (MVP2A) in a rhesus monkey produced reflexive eye movement responses to prosthetic stimulation similar to those observed when using the MVP2. Sinusoidal modulation of stimulus pulse rate from 68–130 pulses per second at frequencies from 0.1 to 5 Hz elicited appropriately-directed slow phase eye velocities ranging in amplitude from 1.9–16.7°/s for the MVP2 and 2.0–14.2°/s for the MVP2A. The eye velocities evoked by MVP2 and MVP2A showed no significant difference (t-test, p = 0.034), suggesting that the MVP2A achieves performance at least as good as the larger MVP2. PMID:25974945

  3. Structures of HIV-1-Env V1V2 with broadly neutralizing antibodies reveal commonalities that enable vaccine design

    PubMed Central

    Gorman, Jason; Soto, Cinque; Yang, Max M.; Davenport, Thaddeus M.; Guttman, Miklos; Bailer, Robert T.; Chambers, Michael; Chuang, Gwo-Yu; DeKosky, Brandon J.; Doria-Rose, Nicole A.; Druz, Aliaksandr; Ernandes, Michael J.; Georgiev, Ivelin S.; Jarosinski, Marissa C.; Joyce, M. Gordon; Lemmin, Thomas M.; Leung, Sherman; Louder, Mark K.; McDaniel, Jonathan R.; Narpala, Sandeep; Pancera, Marie; Stuckey, Jonathan; Wu, Xueling; Yang, Yongping; Zhang, Baoshan; Zhou, Tongqing; Mullikin, James C.; Baxa, Ulrich; Georgiou, George; McDermott, Adrian B.; Bonsignori, Mattia; Haynes, Barton F.; Moore, Penny L.; Morris, Lynn; Lee, Kelly K.; Shapiro, Lawrence; Mascola, John R.; Kwong, Peter D.

    2016-01-01

    Broadly neutralizing antibodies (bNAbs) against HIV-1-Env V1V2 arise in multiple donors. However, atomic-level interactions had only been determined with antibodies from a single donor, making commonalities in recognition uncertain. Here we report the co-crystal structure of V1V2 with antibody CH03 from a second donor and model Env interactions of antibody CAP256-VRC26 from a third. These V1V2-directed bNAbs utilized strand-strand interactions between a protruding antibody loop and a V1V2 strand, but differed in their N-glycan recognition. Ontogeny analysis indicated protruding loops to develop early, with glycan interactions maturing over time. Altogether, the multidonor information suggested V1V2-directed bNAbs to form an ‘extended class’, for which we engineered ontogeny-specific antigens: Env trimers with chimeric V1V2s that interacted with inferred ancestor and intermediate antibodies. The ontogeny-based design of vaccine antigens described here may provide a general means for eliciting antibodies of a desired class. PMID:26689967

  4. Structure of HIV-1 gp120 V1/V2 domain with broadly neutralizing antibody PG9

    SciTech Connect

    McLellan, Jason S.; Pancera, Marie; Carrico, Chris; Gorman, Jason; Julien, Jean-Philippe; Khayat, Reza; Louder, Robert; Pejchal, Robert; Sastry, Mallika; Dai, Kaifan; O’Dell, Sijy; Patel, Nikita; Shahzad-ul-Hussan, Syed; Yang, Yongping; Zhang, Baoshan; Zhou, Tongqing; Zhu, Jiang; Boyington, Jeffrey C.; Chuang, Gwo-Yu; Diwanji, Devan; Georgiev, Ivelin; Kwon, Young Do; Lee, Doyung; Louder, Mark K.; Moquin, Stephanie; Schmidt, Stephen D.; Yang, Zhi-Yong; Bonsignori, Mattia; Crump, John A.; Kapiga, Saidi H.; Sam, Noel E.; Haynes, Barton F.; Burton, Dennis R.; Koff, Wayne C.; Walker, Laura M.; Phogat, Sanjay; Wyatt, Richard; Orwenyo, Jared; Wang, Lai-Xi; Arthos, James; Bewley, Carole A.; Mascola, John R.; Nabel, Gary J.; Schief, William R.; Ward, Andrew B.; Wilson, Ian A.; Kwong, Peter D.

    2012-12-13

    Variable regions 1 and 2 (V1/V2) of human immunodeficiency virus-1 (HIV-1) gp120 envelope glycoprotein are critical for viral evasion of antibody neutralization, and are themselves protected by extraordinary sequence diversity and N-linked glycosylation. Human antibodies such as PG9 nonetheless engage V1/V2 and neutralize 80% of HIV-1 isolates. Here we report the structure of V1/V2 in complex with PG9. V1/V2 forms a four-stranded {beta}-sheet domain, in which sequence diversity and glycosylation are largely segregated to strand-connecting loops. PG9 recognition involves electrostatic, sequence-independent and glycan interactions: the latter account for over half the interactive surface but are of sufficiently weak affinity to avoid autoreactivity. The structures of V1/V2-directed antibodies CH04 and PGT145 indicate that they share a common mode of glycan penetration by extended anionic loops. In addition to structurally defining V1/V2, the results thus identify a paradigm of antibody recognition for highly glycosylated antigens, which - with PG9 - involves a site of vulnerability comprising just two glycans and a strand.

  5. Structure of HIV-1 gp120 V1/V2 domain with broadly neutralizing antibody PG9.

    PubMed

    McLellan, Jason S; Pancera, Marie; Carrico, Chris; Gorman, Jason; Julien, Jean-Philippe; Khayat, Reza; Louder, Robert; Pejchal, Robert; Sastry, Mallika; Dai, Kaifan; O'Dell, Sijy; Patel, Nikita; Shahzad-ul-Hussan, Syed; Yang, Yongping; Zhang, Baoshan; Zhou, Tongqing; Zhu, Jiang; Boyington, Jeffrey C; Chuang, Gwo-Yu; Diwanji, Devan; Georgiev, Ivelin; Kwon, Young Do; Lee, Doyung; Louder, Mark K; Moquin, Stephanie; Schmidt, Stephen D; Yang, Zhi-Yong; Bonsignori, Mattia; Crump, John A; Kapiga, Saidi H; Sam, Noel E; Haynes, Barton F; Burton, Dennis R; Koff, Wayne C; Walker, Laura M; Phogat, Sanjay; Wyatt, Richard; Orwenyo, Jared; Wang, Lai-Xi; Arthos, James; Bewley, Carole A; Mascola, John R; Nabel, Gary J; Schief, William R; Ward, Andrew B; Wilson, Ian A; Kwong, Peter D

    2011-11-23

    Variable regions 1 and 2 (V1/V2) of human immunodeficiency virus-1 (HIV-1) gp120 envelope glycoprotein are critical for viral evasion of antibody neutralization, and are themselves protected by extraordinary sequence diversity and N-linked glycosylation. Human antibodies such as PG9 nonetheless engage V1/V2 and neutralize 80% of HIV-1 isolates. Here we report the structure of V1/V2 in complex with PG9. V1/V2 forms a four-stranded β-sheet domain, in which sequence diversity and glycosylation are largely segregated to strand-connecting loops. PG9 recognition involves electrostatic, sequence-independent and glycan interactions: the latter account for over half the interactive surface but are of sufficiently weak affinity to avoid autoreactivity. The structures of V1/V2-directed antibodies CH04 and PGT145 indicate that they share a common mode of glycan penetration by extended anionic loops. In addition to structurally defining V1/V2, the results thus identify a paradigm of antibody recognition for highly glycosylated antigens, which-with PG9-involves a site of vulnerability comprising just two glycans and a strand.

  6. Mutation analysis of the c-mos proto-oncogene in human ovarian teratomas.

    PubMed Central

    de Foy, K. A.; Gayther, S. A.; Colledge, W. H.; Crockett, S.; Scott, I. V.; Evans, M. J.; Ponder, B. A.

    1998-01-01

    Female transgenic mice lacking a functional c-mos proto-oncogene develop ovarian teratomas, indicating that c-mos may behave as a tumour-suppressor gene for this type of tumour. We have analysed the entire coding region of the c-MOS gene in a series of human ovarian teratomas to determine whether there are any cancer-causing alterations. DNA from twenty teratomas was analysed by single-strand conformational analysis (SSCA) and heteroduplex analysis (HA) to screen for somatic and germline mutations. In nine of these tumours the entire gene was also sequenced. A previously reported polymorphism and a single new sequence variant were identified, neither of which we would predict to be disease-causing alterations. These results suggest that mutations in the coding region of the c-MOS gene do not play a significant role in the genesis of human ovarian teratomas. Images Figure 1 PMID:9635841

  7. Prediction and measurement of radiation damage to CMOS devices on board spacecraft

    NASA Technical Reports Server (NTRS)

    Cliff, R. A.; Danchenko, V.; Stassinopoulos, E. G.; Sing, M.; Brucker, G. J.; Ohanian, R. S.

    1976-01-01

    The CMOS Radiation Effects Measurement (CREM) experiment is presently being flown on the Explorer-55. The purpose of the experiment is to evaluate device performance in the actual space radiation environment and to correlate the respective measurements to on-the-ground laboratory irradiation results. The experiment contains an assembly of C-MOS and P-MOS devices shielded in front by flat slabs of aluminum and by a practically infinite shield in the back. Predictions of radiation damage to C-MOS devices are based on standard environment models and computational techniques. A comparison of the shifts in CMOS threshold potentials, that is, those measured in space to those obtained from the on-the-ground simulation experiment with Co-60, indicates that the measured space damage is smaller than predicted by about a factor of 2-3 for thin shields, but agrees well with predictions for thicker shields.

  8. Implantable optogenetic device with CMOS IC technology for simultaneous optical measurement and stimulation

    NASA Astrophysics Data System (ADS)

    Haruta, Makito; Kamiyama, Naoya; Nakajima, Shun; Motoyama, Mayumi; Kawahara, Mamiko; Ohta, Yasumi; Yamasaki, Atsushi; Takehara, Hiroaki; Noda, Toshihiko; Sasagawa, Kiyotaka; Ishikawa, Yasuyuki; Tokuda, Takashi; Hashimoto, Hitoshi; Ohta, Jun

    2017-05-01

    In this study, we have developed an implantable optogenetic device that can measure and stimulate neurons by an optical method based on CMOS IC technology. The device consist of a blue LED array for optically patterned stimulation, a CMOS image sensor for acquiring brain surface image, and eight green LEDs surrounding the CMOS image sensor for illumination. The blue LED array is placed on the CMOS image sensor. We implanted the device in the brain of a genetically modified mouse and successfully demonstrated the stimulation of neurons optically and simultaneously acquire intrinsic optical images of the brain surface using the image sensor. The integrated device can be used for simultaneously measuring and controlling neuronal activities in a living animal, which is important for the artificial control of brain functions.

  9. Compressive Sensing Based Bio-Inspired Shape Feature Detection CMOS Imager

    NASA Technical Reports Server (NTRS)

    Duong, Tuan A. (Inventor)

    2015-01-01

    A CMOS imager integrated circuit using compressive sensing and bio-inspired detection is presented which integrates novel functions and algorithms within a novel hardware architecture enabling efficient on-chip implementation.

  10. CMOS color image sensor with overlaid organic photoconductive layers having narrow absorption band

    NASA Astrophysics Data System (ADS)

    Takada, Shunji; Ihama, Mikio; Inuiya, Masafumi; Komatsu, Takashi; Saito, Takahiro

    2007-02-01

    At EI2006, we proposed the CMOS image sensor, which was overlaid with organic photoconductive layers in order to incorporate in it large light-capturing ability of a color film owing to its multiple-layer structure, and demonstrated the pictures taken by the trial product of the proposed CMOS image sensor overlaid with an organic layer having green sensitivity. In this study, we have tried to get the optimized spectral sensitivity for the proposed CMOS image sensor by means of the simulation to minimize the color difference between the original Macbeth chart and its reproduction with the spectral sensitivity of the sensor as a parameter. As a result, it has been confirmed that the proposed CMOS image sensor with multiple-layer structure possesses high potential capability in terms of imagecapturing efficiency when it is provided with the optimized spectral sensitivity.

  11. ''Normal'' tissues from humans exposed to radium contain an alteration in the c-mos locus

    SciTech Connect

    Huberman, E.; Schlenker, R.A.; Hardwick, J.P.

    1989-01-01

    The structures of a number of human proto-oncogenes from persons with internal systemic exposure to radium were analyzed by restriction enzyme digestion and southern blotting of their DNA. Two extra c-mos Eco R1 restriction-fragment-length bands of 5.0 kb and 5.5 kb were found in tissue DNA from six of seven individuals. The extra c-mos bands were detected in DNA from many, but not all, of the tissues of the individuals exposed to radium. Our results suggest that the c-mos restriction-fragment-length alterations (RFLA) found in individuals exposed to radium were induced rather than inherited, are epigenetic in origin, and most likely result from changes in the methylation of bases surrounding the single exon of the c-mos proto-oncogene. 7 refs., 3 figs., 2 tabs.

  12. An integrating CMOS APS for X-ray imaging with an in-pixel preamplifier

    NASA Astrophysics Data System (ADS)

    Abdalla, M. A.; Fröjdh, C.; Petersson, C. S.

    2001-06-01

    We present in this paper an integrating CMOS Active Pixel Sensor (APS) circuit coated with scintillator type sensors for intra-oral dental X-ray imaging systems. The photosensing element in the pixel is formed by the p-diffusion on the n-well diode. The advantage of this photosensor is its very low direct absorption of X-rays compared to the other available photosensing elements in the CMOS pixel. The pixel features an integrating capacitor in the feedback loop of a preamplifier of a finite gain in order to increase the optical sensitivity. To verify the effectiveness of this in-pixel preamplification, a prototype 32×80 element CMOS active pixel array was implemented in a 0.8 μm CMOS double poly, n-well process with a pixel pitch of 50 μm. Measured results confirmed the improved optical sensitivity performance of the APS. Various measurements on device performance are presented.

  13. Development of radiation hard CMOS active pixel sensors for HL-LHC

    NASA Astrophysics Data System (ADS)

    Pernegger, Heinz

    2016-07-01

    New pixel detectors, based on commercial high voltage and/or high resistivity full CMOS processes, hold promise as next-generation active pixel sensors for inner and intermediate layers of the upgraded ATLAS tracker. The use of commercial CMOS processes allow cost-effective detector construction and simpler hybridisation techniques. The paper gives an overview of the results obtained on AMS-produced CMOS sensors coupled to the ATLAS Pixel FE-I4 readout chips. The SOI (silicon-on-insulator) produced sensors by XFAB hold great promise as radiation hard SOI-CMOS sensors due to their combination of partially depleted SOI transistors reducing back-gate effects. The test results include pre-/post-irradiation comparison, measurements of charge collection regions as well as test beam results.

  14. A CMOS Microdisplay Utilizing Hot Carrier Electroluminescence From Reverse-biased Si PN Junctions

    NASA Astrophysics Data System (ADS)

    Xu, Kaikai; Snyman, Lukas W.; Polleux, Jean-Luc; Aharoni, Herzl

    2017-06-01

    The emission of visible light by a monolithically integrated Si p-n junction under reverse bias is presented, and a fully CMOS integrated optical-type fingerprint sensor using Si light emitting devices is achieved.

  15. Differences in selectivity to natural images in early visual areas (V1-V3).

    PubMed

    Coggan, David D; Allen, Luke A; Farrar, Oliver R H; Gouws, Andre D; Morland, Antony B; Baker, Daniel H; Andrews, Timothy J

    2017-05-26

    High-level regions of the ventral visual pathway respond more to intact objects compared to scrambled objects. The aim of this study was to determine if this selectivity for objects emerges at an earlier stage of processing. Visual areas (V1-V3) were defined for each participant using retinotopic mapping. Participants then viewed intact and scrambled images from different object categories (bottle, chair, face, house, shoe) while neural responses were measured using fMRI. Our rationale for using scrambled images is that they contain the same low-level properties as the intact objects, but lack the higher-order combinations of features that are characteristic of natural images. Neural responses were higher for scrambled than intact images in all regions. However, the difference between intact and scrambled images was smaller in V3 compared to V1 and V2. Next, we measured the spatial patterns of response to intact and scrambled images from different object categories. We found higher within-category compared to between category correlations for both intact and scrambled images demonstrating distinct patterns of response. Spatial patterns of response were more distinct for intact compared to scrambled images in V3, but not in V1 or V2. These findings demonstrate the emergence of selectivity to natural images in V3.

  16. Off-Line Testing for Bridge Faults in CMOS Domino Logic Circuits

    NASA Technical Reports Server (NTRS)

    Bennett, K.; Lala, P. K.; Busaba, F.

    1997-01-01

    Bridge faults, especially in CMOS circuits, have unique characteristics which make them difficult to detect during testing. This paper presents a technique for detecting bridge faults which have an effect on the output of CMOS Domino logic circuits. The faults are modeled at the transistor level and this technique is based on analyzing the off-set of the function during off-line testing.

  17. CMOS-based smart-electrode-type retinal stimulator with bullet-shaped bulk Pt electrodes.

    PubMed

    Tokuda, T; Ito, T; Kitao, T; Noda, T; Sasagawa, K; Terasawa, Y; Tashiro, H; Kanda, H; Fujikado, T; Ohta, J

    2011-01-01

    A CMOS-based flexible retinal stimulator equipped with bullet-shaped bulk Pt electrodes was fabricated and demonstrated. We designed a new CMOS unit chip with an on-chip stimulator, single- and multi-site stimulation modes, and monitoring functions. We have developed a new structure and packaging process of flexible retinal stimulator with bullet-type bulk Pt electrode. We have confirmed the retinal stimulation functionality in an in vivo stimulation trial on rabbit's retina.

  18. e2v CCD and CMOS sensors and systems designed for astronomical applications

    NASA Astrophysics Data System (ADS)

    Jorden, Paul; Jerram, Paul; Jordan, Douglas; Pratlong, Jérôme; Robbins, Mark

    2016-08-01

    e2v continues to evolve its product range of sensors and systems, with CCD and CMOS sensors. We describe recent developments of high performance image sensors and precision system components. Several low noise backthinned CMOS sensors have been developed for scientific applications. CCDs have become larger whilst retaining very low noise and high quantum efficiency. Examples of sensors and sub-systems are presented including the recently completed 1.2 GigaPixel J-PAS cryogenic camera.

  19. CMOS image sensor-based implantable glucose sensor using glucose-responsive fluorescent hydrogel

    PubMed Central

    Tokuda, Takashi; Takahashi, Masayuki; Uejima, Kazuhiro; Masuda, Keita; Kawamura, Toshikazu; Ohta, Yasumi; Motoyama, Mayumi; Noda, Toshihiko; Sasagawa, Kiyotaka; Okitsu, Teru; Takeuchi, Shoji; Ohta, Jun

    2014-01-01

    A CMOS image sensor-based implantable glucose sensor based on an optical-sensing scheme is proposed and experimentally verified. A glucose-responsive fluorescent hydrogel is used as the mediator in the measurement scheme. The wired implantable glucose sensor was realized by integrating a CMOS image sensor, hydrogel, UV light emitting diodes, and an optical filter on a flexible polyimide substrate. Feasibility of the glucose sensor was verified by both in vitro and in vivo experiments. PMID:25426316

  20. Low temperature selective silicon-germanium-boron alloy technology for nanoscale CMOS junctions and contacts

    NASA Astrophysics Data System (ADS)

    Gannavaram, Shyam Akshay

    As device dimensions continue to scale down into the sub-100 nm CMOS (Complimentary Metal-Oxide-Semiconductor) regime, enormous challenges with respect to formation of advanced junctions and contacts are encountered. These challenges come in the form of the need for ultra-shallow extension junctions (<20 nm) with very low sheet resistances (<400 O/sq.), with near-perfect, laterally abrupt profiles (<2 nm/decade) and process compatibility with respect to ultra-low resistivity metal (silicide) contact formation. In this work, a novel junction formation method was developed to address the above-mentioned problems simultaneously. In order to achieve above-equilibrium activation at low temperatures, a diffusion-free junction process based on in-situ activated Silicon-Germanium-Boron ternary alloy as-deposited junctions was proposed as potential solutions for end-of-the-roadmap ultra-shallow p +/n junctions. These films were grown at 500°C by Ultra-High Vacuum Rapid Thermal Chemical Vapor Deposition (UHV-RTCVD). In order to achieve above-equilibrium stable dopant activation, a novel idea that allowed for the substitutional incorporation of very high levels of boron in a strained SiGe lattice was employed. The reverse junction leakage of the as-deposited and annealed junctions satisfied a stringent budget of 1% of the device off-state leakage for both, the high performance and low power designs. Temperature dependent leakage current measurements indicated a generation-dominated current for temperatures in the range of device operation ( VR = -1 V, 25--100°C) and band-to-band tunneling only at high biases (>4 V). The nominal slope of the junction doping profile decay from SIMS was estimated to be less than 4 nm/decade. Subsequent improvements in determining the actual junction abruptness by reducing the SIMS primary beam energy were incremental owing to nonelimination of other artifacts. To overcome these limitations, the junction abruptness was quantified using the

  1. A multiply-add engine with monolithically integrated 3D memristor crossbar/CMOS hybrid circuit

    NASA Astrophysics Data System (ADS)

    Chakrabarti, B.; Lastras-Montaño, M. A.; Adam, G.; Prezioso, M.; Hoskins, B.; Cheng, K.-T.; Strukov, D. B.

    2017-02-01

    Silicon (Si) based complementary metal-oxide semiconductor (CMOS) technology has been the driving force of the information-technology revolution. However, scaling of CMOS technology as per Moore’s law has reached a serious bottleneck. Among the emerging technologies memristive devices can be promising for both memory as well as computing applications. Hybrid CMOS/memristor circuits with CMOL (CMOS + “Molecular”) architecture have been proposed to combine the extremely high density of the memristive devices with the robustness of CMOS technology, leading to terabit-scale memory and extremely efficient computing paradigm. In this work, we demonstrate a hybrid 3D CMOL circuit with 2 layers of memristive crossbars monolithically integrated on a pre-fabricated CMOS substrate. The integrated crossbars can be fully operated through the underlying CMOS circuitry. The memristive devices in both layers exhibit analog switching behavior with controlled tunability and stable multi-level operation. We perform dot-product operations with the 2D and 3D memristive crossbars to demonstrate the applicability of such 3D CMOL hybrid circuits as a multiply-add engine. To the best of our knowledge this is the first demonstration of a functional 3D CMOL hybrid circuit.

  2. A Low-Cost CMOS-MEMS Piezoresistive Accelerometer with Large Proof Mass

    PubMed Central

    Khir, Mohd Haris Md; Qu, Peng; Qu, Hongwei

    2011-01-01

    This paper reports a low-cost, high-sensitivity CMOS-MEMS piezoresistive accelerometer with large proof mass. In the device fabricated using ON Semiconductor 0.5 μm CMOS technology, an inherent CMOS polysilicon thin film is utilized as the piezoresistive sensing material. A full Wheatstone bridge was constructed through easy wiring allowed by the three metal layers in the 0.5 μm CMOS technology. The device fabrication process consisted of a standard CMOS process for sensor configuration, and a deep reactive ion etching (DRIE) based post-CMOS microfabrication for MEMS structure release. A bulk single-crystal silicon (SCS) substrate is included in the proof mass to increase sensor sensitivity. In device design and analysis, the self heating of the polysilicon piezoresistors and its effect to the sensor performance is also discussed. With a low operating power of 1.5 mW, the accelerometer demonstrates a sensitivity of 0.077 mV/g prior to any amplification. Dynamic tests have been conducted with a high-end commercial calibrating accelerometer as reference. PMID:22164052

  3. A multiply-add engine with monolithically integrated 3D memristor crossbar/CMOS hybrid circuit.

    PubMed

    Chakrabarti, B; Lastras-Montaño, M A; Adam, G; Prezioso, M; Hoskins, B; Payvand, M; Madhavan, A; Ghofrani, A; Theogarajan, L; Cheng, K-T; Strukov, D B

    2017-02-14

    Silicon (Si) based complementary metal-oxide semiconductor (CMOS) technology has been the driving force of the information-technology revolution. However, scaling of CMOS technology as per Moore's law has reached a serious bottleneck. Among the emerging technologies memristive devices can be promising for both memory as well as computing applications. Hybrid CMOS/memristor circuits with CMOL (CMOS + "Molecular") architecture have been proposed to combine the extremely high density of the memristive devices with the robustness of CMOS technology, leading to terabit-scale memory and extremely efficient computing paradigm. In this work, we demonstrate a hybrid 3D CMOL circuit with 2 layers of memristive crossbars monolithically integrated on a pre-fabricated CMOS substrate. The integrated crossbars can be fully operated through the underlying CMOS circuitry. The memristive devices in both layers exhibit analog switching behavior with controlled tunability and stable multi-level operation. We perform dot-product operations with the 2D and 3D memristive crossbars to demonstrate the applicability of such 3D CMOL hybrid circuits as a multiply-add engine. To the best of our knowledge this is the first demonstration of a functional 3D CMOL hybrid circuit.

  4. A multiply-add engine with monolithically integrated 3D memristor crossbar/CMOS hybrid circuit

    PubMed Central

    Chakrabarti, B.; Lastras-Montaño, M. A.; Adam, G.; Prezioso, M.; Hoskins, B.; Cheng, K.-T.; Strukov, D. B.

    2017-01-01

    Silicon (Si) based complementary metal-oxide semiconductor (CMOS) technology has been the driving force of the information-technology revolution. However, scaling of CMOS technology as per Moore’s law has reached a serious bottleneck. Among the emerging technologies memristive devices can be promising for both memory as well as computing applications. Hybrid CMOS/memristor circuits with CMOL (CMOS + “Molecular”) architecture have been proposed to combine the extremely high density of the memristive devices with the robustness of CMOS technology, leading to terabit-scale memory and extremely efficient computing paradigm. In this work, we demonstrate a hybrid 3D CMOL circuit with 2 layers of memristive crossbars monolithically integrated on a pre-fabricated CMOS substrate. The integrated crossbars can be fully operated through the underlying CMOS circuitry. The memristive devices in both layers exhibit analog switching behavior with controlled tunability and stable multi-level operation. We perform dot-product operations with the 2D and 3D memristive crossbars to demonstrate the applicability of such 3D CMOL hybrid circuits as a multiply-add engine. To the best of our knowledge this is the first demonstration of a functional 3D CMOL hybrid circuit. PMID:28195239

  5. Single event effects in 0.18μm CMOS image sensors

    NASA Astrophysics Data System (ADS)

    Rushton, Joseph E.; Stefanov, Konstantin D.; Holland, Andrew D.; Bugnet, Henri; Mayer, Frederic; Cordrey-Gale, Matthew; Endicott, James

    2016-08-01

    CMOS image sensors are widely used on Earth and are becoming increasingly favourable for use in space. Advantages, such as low power consumption, and ever-improving imaging peformance make CMOS an attractive option. The ability to integrate camera functions on-chip, such as biasing and sequencing, simplifies designing with CMOS sensors and can improve system reliability. One potential disadvantage to the use of CMOS is the possibility of single event effects, such as single event latchup (SEL), which can cause malfunctions or even permanent destruction of the sensor. These single event effects occur in the space environment due to the high levels of radiation incident on the sensor. This work investigates the ocurrence of SEL in CMOS image sensors subjected to heavy-ion irradiation. Three devices are investigated, two of which have triple-well doping implants. The resulting latchup cross-sections are presented. It is shown that using a deep p well on 18 μm epitaxial silicon increases the radiation hardness of the sensor against latchup. The linear energy transfer (LET) threshold for latchup is increased when using this configuration. Our findings suggest deep p wells can be used to increase the radiation tolerance of CMOS image sensors for use in future space missions.

  6. Nanowatt-Power-Level Automatic Switch Combining ED-CMOS Circuit and LED

    NASA Astrophysics Data System (ADS)

    Utsunomiya, Fumiyasu; Douseki, Takakuni

    A nanowatt-power-level automatic switch that combines a multi-Vth CMOS level converter and an LED as a photodiode has been developed for a sensor application. The level converter is a single-input latch-type multi-Vth CMOS circuit featuring the use of an enhancement-mode nMOSFET and a depletion-mode common-gate nMOSFET as a pair of driver transistors. The ED-CMOS level converter cuts the DC current path; and the LED, which generates a high output voltage under illumination, suppresses the leakage current of the depletion-mode common-gate nMOSFET in the ED-CMOS level converter, resulting in nanowatt-order power dissipation. To verify the effectiveness of the ED-CMOS circuit, a prototype level converter was fabricated on a 0.6-µm CMOS process and used in an automatic switch in a wireless mouse. The switch is composed of two LEDs, a current-mirror circuit, the level converter, and a power switch MOSFET. It senses when a hand grabs or releases the mouse and automatically turns the mouse on or off, respectively. The measured power dissipation of the mouse is 3nW in the standby mode.

  7. CMOS-APS Detectors for Solar Physics: Lessons Learned during the SWAP Preflight Calibration

    NASA Astrophysics Data System (ADS)

    de Groof, A.; Berghmans, D.; Nicula, B.; Halain, J.-P.; Defise, J.-M.; Thibert, T.; Schühle, U.

    2008-05-01

    CMOS-APS imaging detectors open new opportunities for remote sensing in solar physics beyond what classical CCDs can provide, offering far less power consumption, simpler electronics, better radiation hardness, and the possibility of avoiding a mechanical shutter. The SWAP telescope onboard the PROBA2 technology demonstration satellite of the European Space Agency will be the first actual implementation of a CMOS-APS detector for solar physics in orbit. One of the goals of the SWAP project is precisely to acquire experience with the CMOS-APS technology in a real-live space science context. Such a precursor mission is essential in the preparation of missions such as Solar Orbiter where the extra CMOS-APS functionalities will be hard requirements. The current paper concentrates on specific CMOS-APS issues that were identified during the SWAP preflight calibration measurements. We will discuss the different readout possibilities that the CMOS-APS detector of SWAP provides and their associated pros and cons. In particular we describe the “image lag” effect, which results in a contamination of each image with a remnant of the previous image. We have characterised this effect for the specific SWAP implementation and we conclude with a strategy on how to successfully circumvent the problem and actually take benefit of it for solar monitoring.

  8. Critical issues for the application of integrated MEMS/CMOS technologies to inertial measurement units

    SciTech Connect

    Smith, J.H.; Ellis, J.R.; Montague, S.; Allen, J.J.

    1997-03-01

    One of the principal applications of monolithically integrated micromechanical/microelectronic systems has been accelerometers for automotive applications. As integrated MEMS/CMOS technologies such as those developed by U.C. Berkeley, Analog Devices, and Sandia National Laboratories mature, additional systems for more sensitive inertial measurements will enter the commercial marketplace. In this paper, the authors will examine key technology design rules which impact the performance and cost of inertial measurement devices manufactured in integrated MEMS/CMOS technologies. These design parameters include: (1) minimum MEMS feature size, (2) minimum CMOS feature size, (3) maximum MEMS linear dimension, (4) number of mechanical MEMS layers, (5) MEMS/CMOS spacing. In particular, the embedded approach to integration developed at Sandia will be examined in the context of these technology features. Presently, this technology offers MEMS feature sizes as small as 1 {micro}m, CMOS critical dimensions of 1.25 {micro}m, MEMS linear dimensions of 1,000 {micro}m, a single mechanical level of polysilicon, and a 100 {micro}m space between MEMS and CMOS. This is applicable to modern precision guided munitions.

  9. CMOS-sensors for energy-resolved X-ray imaging

    NASA Astrophysics Data System (ADS)

    Doering, D.; Amar-Youcef, S.; Baudot, J.; Deveaux, M.; Dulinski, W.; Kachel, M.; Linnik, B.; Müntz, C.; Stroth, Joachim

    2016-01-01

    Due to their low noise, CMOS Monolithic Active Pixel Sensors are suited to sense X-rays with a few keV quantum energy, which is of interest for high resolution X-ray imaging. Moreover, the good energy resolution of the silicon sensors might be used to measure this quantum energy. Combining both features with the good spatial resolution of CMOS sensors opens the potential to build ``color sensitive" X-ray cameras. Taking such colored images is hampered by the need to operate the CMOS sensors in a single photon counting mode, which restricts the photon flux capability of the sensors. More importantly, the charge sharing between the pixels smears the potentially good energy resolution of the sensors. Based on our experience with CMOS sensors for charged particle tracking, we studied techniques to overcome the latter by means of an offline processing of the data obtained from a CMOS sensor prototype. We found that the energy resolution of the pixels can be recovered at the expense of reduced quantum efficiency. We will introduce the results of our study and discuss the feasibility of taking colored X-ray pictures with CMOS sensors.

  10. System-on-Chip Considerations for Heterogeneous Integration of CMOS and Fluidic Bio-Interfaces.

    PubMed

    Datta-Chaudhuri, Timir; Smela, Elisabeth; Abshire, Pamela A

    2016-04-21

    CMOS chips are increasingly used for direct sensing and interfacing with fluidic and biological systems. While many biosensing systems have successfully combined CMOS chips for readout and signal processing with passive sensing arrays, systems that co-locate sensing with active circuits on a single chip offer significant advantages in size and performance but increase the complexity of multi-domain design and heterogeneous integration. This emerging class of lab-on-CMOS systems also poses distinct and vexing technical challenges that arise from the disparate requirements of biosensors and integrated circuits (ICs). Modeling these systems must address not only circuit design, but also the behavior of biological components on the surface of the IC and any physical structures. Existing tools do not support the cross-domain simulation of heterogeneous lab-on-CMOS systems, so we recommend a two-step modeling approach: using circuit simulation to inform physics-based simulation, and vice versa. We review the primary lab-on-CMOS implementation challenges and discuss practical approaches to overcome them. Issues include new versions of classical challenges in system-on-chip integration, such as thermal effects, floor-planning, and signal coupling, as well as new challenges that are specifically attributable to biological and fluidic domains, such as electrochemical effects, non-standard packaging, surface treatments, sterilization, microfabrication of surface structures, and microfluidic integration. We describe these concerns as they arise in lab-on-CMOS systems and discuss solutions that have been experimentally demonstrated.

  11. A low-cost CMOS-MEMS piezoresistive accelerometer with large proof mass.

    PubMed

    Khir, Mohd Haris Md; Qu, Peng; Qu, Hongwei

    2011-01-01

    This paper reports a low-cost, high-sensitivity CMOS-MEMS piezoresistive accelerometer with large proof mass. In the device fabricated using ON Semiconductor 0.5 μm CMOS technology, an inherent CMOS polysilicon thin film is utilized as the piezoresistive sensing material. A full Wheatstone bridge was constructed through easy wiring allowed by the three metal layers in the 0.5 μm CMOS technology. The device fabrication process consisted of a standard CMOS process for sensor configuration, and a deep reactive ion etching (DRIE) based post-CMOS microfabrication for MEMS structure release. A bulk single-crystal silicon (SCS) substrate is included in the proof mass to increase sensor sensitivity. In device design and analysis, the self heating of the polysilicon piezoresistors and its effect to the sensor performance is also discussed. With a low operating power of 1.5 mW, the accelerometer demonstrates a sensitivity of 0.077 mV/g prior to any amplification. Dynamic tests have been conducted with a high-end commercial calibrating accelerometer as reference.

  12. System-on-Chip Considerations for Heterogeneous Integration of CMOS and Fluidic Bio-Interfaces.

    PubMed

    Datta-Chaudhuri, Timir; Smela, Elisabeth; Abshire, Pamela A

    2016-12-01

    CMOS chips are increasingly used for direct sensing and interfacing with fluidic and biological systems. While many biosensing systems have successfully combined CMOS chips for readout and signal processing with passive sensing arrays, systems that co-locate sensing with active circuits on a single chip offer significant advantages in size and performance but increase the complexity of multi-domain design and heterogeneous integration. This emerging class of lab-on-CMOS systems also poses distinct and vexing technical challenges that arise from the disparate requirements of biosensors and integrated circuits (ICs). Modeling these systems must address not only circuit design, but also the behavior of biological components on the surface of the IC and any physical structures. Existing tools do not support the cross-domain simulation of heterogeneous lab-on-CMOS systems, so we recommend a two-step modeling approach: using circuit simulation to inform physics-based simulation, and vice versa. We review the primary lab-on-CMOS implementation challenges and discuss practical approaches to overcome them. Issues include new versions of classical challenges in system-on-chip integration, such as thermal effects, floor-planning, and signal coupling, as well as new challenges that are specifically attributable to biological and fluidic domains, such as electrochemical effects, non-standard packaging, surface treatments, sterilization, microfabrication of surface structures, and microfluidic integration. We describe these concerns as they arise in lab-on-CMOS systems and discuss solutions that have been experimentally demonstrated.

  13. Spatially Resolved Spectroscopy Across HD189733 (K1V) Using Exoplanet Transits

    NASA Astrophysics Data System (ADS)

    Gustavsson, Martin; Dravins, Dainis; Ludwig, Hans-Günter

    2016-06-01

    For testing 3-dimensional models of stellar atmospheres, spectroscopy across spatially resolved stellar surfaces would be desired with a spectral resolution of(R = 100,000) or more. Hydrodynamic models predict variations in line profile shapes, strengths, wavelength positions and asymmetries. These variations vary systematically between disk center and limb and as a function of line strength, excitation potential and wavelength region. However, except for a few supergiants and the Sun, current telescopes are not yet capable of resolving any stellar surfaces. One alternative method to resolve distant stellar surfaces, feasible already now, is differential spectroscopy of transiting exoplanet systems. By subtracting in-transit spectra from the spectrum outside of transit, the spectra from stellar surface portions temporarily hidden behind the planet can be disentangled. Since transiting planets cover only a small portion of the stellar surface, the method requires a very high signal-to-noise ratio, obtainable by averaging numerous similar spectral lines. We apply such differential spectroscopy on the 7.7 mag K1V star HD 189733 ('Alopex'*); its transiting planet covers ˜ 3% of its host star's surface, which is the deepest known transit among the brighter systems. Archival data from the ESO HARPS spectrometerare used to construct averaged profiles of photospheric Fe I lines, with the aim of comparing spatially resolved profiles to analogous synthetic line profiles computed from the 3-dimensional hydrodynamic CO5BOLD model. * We refer to HD 189733 as 'Alopex' (from the Greek 'αλɛπού'), denoting a fox related to the one that gave name to its constellation of Vulpecula.

  14. Expression of an immunogenic F1-V fusion protein in lettuce as a plant-based vaccine against plague.

    PubMed

    Rosales-Mendoza, Sergio; Soria-Guerra, Ruth E; Moreno-Fierros, Leticia; Alpuche-Solís, Angel G; Martínez-González, Luzmila; Korban, Schuyler S

    2010-07-01

    Yersinia pestis is a pathogenic agent that causes the bubonic and pneumonic plague. The development of an efficient and low-cost oral vaccine against these diseases is highly desirable. In this study, the immunogenic fusion protein F1-V from Y. pestis was introduced into lettuce via Agrobacterium-mediated transformation, and putative transgenic lines were developed. The presence of the transgene in these putative transgenic lines was determined using polymerase chain reaction (PCR), and transgene integration and transgene copy number were confirmed following Southern blot analysis. The presence of specific F1-V transcripts was confirmed by reverse-transcriptase (RT)-PCR. Using monoclonal antibodies, ELISA and western blot analysis revealed that the expected antigenic F1-V protein was successfully expressed in transgenic lines. Mice immunized subcutaneously with lettuce expressing the F1-V antigen developed systemic humoral responses as 'proof of concept' of using lettuce as a production platform for the F1-V immunogen that could be used as a candidate plant-based vaccine against plague.

  15. Integration of room temperature single electron transistor with CMOS subsystem

    NASA Astrophysics Data System (ADS)

    Cheam, Daw Don

    The single electron transistor (SET) is a charge-based device that may complement the dominant metal-oxide-semiconductor field effect transistor (MOSFET) technology. As the cost of scaling MOSFET to smaller dimensions are rising and the the basic functionality of MOSFET is encountering numerous challenges at dimensions smaller than 10nm, the SET has shown the potential to become the next generation device which operates based on the tunneling of electrons. Since the electron transfer mechanism of a SET device is based on the non-dissipative electron tunneling effect, the power consumption of a SET device is extremely low, estimated to be on the order of 10--18 J. The objectives of this research are to demonstrate technologies that would enable the mass produce of SET devices that are operational at room temperature and to integrate these devices on top of an active complementary-MOSFET (CMOS) substrate. To achieve these goals, two fabrication techniques are considered in this work. The Focus Ion Beam (FIB) technique is used to fabricate the islands and the tunnel junctions of the SET device. A Ultra-Violet (UV) light based Nano-Imprint Lithography (NIL) call Step-and-Flash-Imprint Lithography (SFIL) is used to fabricate the interconnections of the SET devices. Combining these two techniques, a full array of SET devices are fabricated on a planar substrate. Test and characterization of the SET devices has shown consistent Coulomb blockade effect, an important single electron characteristic. To realize a room temperature operational SET device that function as a logic device to work along CMOS, it is important to know the device behavior at different temperatures. Based on the theory developed for a single island SET device, a thermal analysis is carried out on the multi-island SET device and the observation of changes in Coulomb blockade effect is presented. The results show that the multi-island SET device operation highly depends on temperature. The important

  16. A low-cost CMOS neurological sensor array

    NASA Astrophysics Data System (ADS)

    Newman, Paul J.; Lisner, Peter; Yeow, Y.; Choy, Peng; Lavidis, Nick A.

    2005-02-01

    Current methods used to study neural communication have not been able to achieve both good spatial and temporal resolution of recordings. There are two ways to record synaptic potentials from nerve endings: recordings using single or dual intracellular or extra cellular metal electrodes give good temporal resolution but poor spatial resolution, and recording activity with fluorescent dyes gives good spatial resolution but poor temporal resolution. Such medical research activity in the area of neurological signal detection has thus identified a requirement for the design of a CMOS circuit that contains an array of independent sensors. As both spatial and temporal distribution of acquired data is required in this application, the circuit must be capable of continuous measurement of synaptic potentials from an array of points on a tissue sample, with a 10 μm separation between sensor points. The major requirement for the circuit is that it is capable of sensing synaptic potentials of the order of several mV, with a resolution of 0.05 mV. For data recording purposes, the circuit must amplify these synaptic potentials and digitise them together with their locations in the sensor array. Finally, the circuit must be biologically inert, to avoid specimen deterioration. This paper presents the design of a prototype single-chip circuit, which provides a 6 x 3 array of independent synaptic potential sensors. The signal from each of the sensors is amplified and time-multiplexed into an on-chip A/D converter. The circuit provides an 8-bit synaptic potential value, together with an 8-bit field containing array location and trigger signals suitable for external data acquisition instrumentation. Our test circuit is implemented in a low-cost 0.5 um, 5 V CMOS process. The fabricated die is mounted in a standard 40 pin DIP ceramic package, with no lid to allow direct contact of the die surface with the tissue sample. The only post-processing step required for these packages is to

  17. A digital output accelerometer using MEMS-based piezoelectric accelerometers and arrayed CMOS inverters with satellite capacitors

    NASA Astrophysics Data System (ADS)

    Kobayashi, T.; Okada, H.; Masuda, T.; Maeda, R.; Itoh, T.

    2011-06-01

    The present paper describes the development of a digital output accelerometer composed of microelectromechanical systems (MEMS)-based piezoelectric accelerometers and arrayed complementary metal-oxide-semiconductor (CMOS) inverters accompanied by capacitors. The piezoelectric accelerometers were fabricated from multilayers of Pt/Ti/PZT/Pt/Ti/SiO2 deposited on silicon-on-insulator (SOI) wafers. The fabricated piezoelectric accelerometers were connected to arrayed CMOS inverters. Each of the CMOS inverters was accompanied by a capacitor with a different capacitance called a 'satellite capacitor'. We have confirmed that the output voltage generated from the piezoelectric accelerometers can vary the output of the CMOS inverters from a high to a low level; the state of the CMOS inverters has turned from the 'off-state' into the 'on-state' when the output voltage of the piezoelectric accelerometers is larger than the threshold voltage of the CMOS inverters. We have also confirmed that the CMOS inverters accompanied by the larger satellite capacitor have become 'on-state' at a lower acceleration. On increasing the acceleration, the number of on-state CMOS inverters has increased. Assuming that the on-state and off-state of CMOS inverters correspond to logic '0' and '1', the present digital output accelerometers have expressed the accelerations of 2.0, 3.0, 5.0, and 5.5 m s - 2 as digital outputs of 111, 110, 100, and 000, respectively.

  18. Users Guide on Scaled CMOS Reliability: NASA Electronic Parts and Packaging (NEPP) Program Office of Safety and Mission Assurance

    NASA Technical Reports Server (NTRS)

    White, Mark; Cooper, Mark; Johnston, Allan

    2011-01-01

    Reliability of advanced CMOS technology is a complex problem that is usually addressed from the standpoint of specific failure mechanisms rather than overall reliability of a finished microcircuit. A detailed treatment of CMOS reliability in scaled devices can be found in Ref. 1; it should be consulted for a more thorough discussion. The present document provides a more concise treatment of the scaled CMOS reliability problem, emphasizing differences in the recommended approach for these advanced devices compared to that of less aggressively scaled devices. It includes specific recommendations that can be used by flight projects that use advanced CMOS. The primary emphasis is on conventional memories, microprocessors, and related devices.

  19. Users Guide on Scaled CMOS Reliability: NASA Electronic Parts and Packaging (NEPP) Program Office of Safety and Mission Assurance

    NASA Technical Reports Server (NTRS)

    White, Mark; Cooper, Mark; Johnston, Allan

    2011-01-01

    Reliability of advanced CMOS technology is a complex problem that is usually addressed from the standpoint of specific failure mechanisms rather than overall reliability of a finished microcircuit. A detailed treatment of CMOS reliability in scaled devices can be found in Ref. 1; it should be consulted for a more thorough discussion. The present document provides a more concise treatment of the scaled CMOS reliability problem, emphasizing differences in the recommended approach for these advanced devices compared to that of less aggressively scaled devices. It includes specific recommendations that can be used by flight projects that use advanced CMOS. The primary emphasis is on conventional memories, microprocessors, and related devices.

  20. Stabilized HIV-1 envelope glycoprotein trimers lacking the V1V2 domain, obtained by virus evolution.

    PubMed

    Bontjer, Ilja; Melchers, Mark; Eggink, Dirk; David, Kathryn; Moore, John P; Berkhout, Ben; Sanders, Rogier W

    2010-11-19

    The envelope glycoproteins (Env) are the focus of HIV-1 vaccine development strategies based on the induction of humoral immunity, but the mechanisms the virus has evolved to limit the induction and binding of neutralizing antibodies (NAbs) constitute substantial obstacles. Conserved neutralization epitopes are shielded by variable regions and carbohydrates, so one strategy to increase their exposure and, it is hoped, their immunogenicity is to delete the overlying variable loops. However, deleting the variable regions from Env trimers can be problematic, because hydrophobic patches that are normally solvent-inaccessible now become exposed, causing protein misfolding or aggregation, for example. Here, we describe the construction and characterization of recombinant gp140 trimers lacking variable domains 1 and 2 (ΔV1V2). The design of the trimers was guided by HIV-1 evolution studies that identified compensatory changes in V1V2-deleted but functional Env proteins (Bontjer, I., Land, A., Eggink, D., Verkade, E., Tuin, K., Baldwin, C., Pollakis, G., Paxton, W. A., Braakman, I., Berkhout, B., and Sanders, R. W. (2009) J. Virol. 83, 368-383). We now show that specific compensatory changes improved the function of ΔV1V2 Env proteins and hence HIV-1 replication. The changes acted by reducing the exposure of a hydrophobic surface either by replacing a hydrophobic residue with a hydrophilic one or by covering the surface with a glycan. The compensatory changes allowed the efficient expression of well folded, soluble gp140 trimers derived from various HIV-1 isolates. The evolved ΔV1V2 Env viruses were extremely sensitive to NAbs, indicating that neutralization epitopes are well exposed, which was confirmed by studies of NAb binding to the soluble ΔV1V2 gp140 trimers. These evolved ΔV1V2 trimers could be useful reagents for immunogenicity and structural studies.